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Sample records for nitride dielectric thin

  1. Dielectric screening in atomically thin boron nitride nanosheets.

    PubMed

    Li, Lu Hua; Santos, Elton J G; Xing, Tan; Cappelluti, Emmanuele; Roldán, Rafael; Chen, Ying; Watanabe, Kenji; Taniguchi, Takashi

    2015-01-14

    Two-dimensional (2D) hexagonal boron nitride (BN) nanosheets are excellent dielectric substrate for graphene, molybdenum disulfide, and many other 2D nanomaterial-based electronic and photonic devices. To optimize the performance of these 2D devices, it is essential to understand the dielectric screening properties of BN nanosheets as a function of the thickness. Here, electric force microscopy along with theoretical calculations based on both state-of-the-art first-principles calculations with van der Waals interactions under consideration, and nonlinear Thomas-Fermi theory models are used to investigate the dielectric screening in high-quality BN nanosheets of different thicknesses. It is found that atomically thin BN nanosheets are less effective in electric field screening, but the screening capability of BN shows a relatively weak dependence on the layer thickness.

  2. Dielectric Screening in Atomically Thin Boron Nitride Nanosheets

    NASA Astrophysics Data System (ADS)

    Li, Lu Hua; Santos, Elton J. G.; Xing, Tan; Cappelluti, Emmanuele; Roldán, Rafael; Chen, Ying; Watanabe, Kenji; Taniguchi, Takashi

    2015-01-01

    Two-dimensional (2D) hexagonal boron nitride (BN) nanosheets are excellent dielectric substrate for graphene, molybdenum disulfide and many other 2D nanomaterials based electronic and photonic devices. To optimize the performance of these 2D devices, it is essential to understand the dielectric screening properties of BN nanosheets as a function of the thickness. Here, electric force microscopy along with theoretical calculations based on both state-of-the-art first-principles calculations with van der Waals interactions under consideration and non-linear Thomas-Fermi theory models are used to investigate the dielectric screening in high-quality BN nanosheets of different thicknesses. It is found that atomically thin BN nanosheets are less effective in electric field screening, but the screening capability of BN shows a relatively weak dependence on the layer thickness.

  3. Investigation on the dielectric behavior of aluminum nitride thin films at different temperatures applying a time-zero approach

    NASA Astrophysics Data System (ADS)

    Schneider, Michael; Bittner, Achim; Schmid, Ulrich

    2013-05-01

    In MEMS (micro electromechanical system) devices, piezoelectric aluminum nitride (AlN) thin films are commonly used as functional material for sensing and actuating purposes. Additionally, AlN features excellent dielectric properties as well as a high chemical and thermal stability, making it also a good choice for passivation purposes for microelectronic devices. With those aspects and current trends towards minimization in mind, the dielectric reliability of thin AlN films is of utmost importance for the realization of advanced device concepts. In this study, we present results on the transversal dielectric strength of 100 nm AlN thin films deposited by dc magnetron sputtering. The dielectric strength was measured using a time-zero approach, where the film is stressed using a fast voltage ramp up to the point of breakdown. The measurements were performed using different contact pad sizes, different voltage ramping speeds and device temperatures, respectively. In order to achieve statistical significance, at least 12 measurements were performed for each environment parameter set and the results analyzed using the Weibull approach. The results show, that the breakdown field in positive direction rises with the pad size, as expected. Furthermore, lower breakdown fields with increasing temperatures up to 300°C are observed with the mean field to failure following an exponential law typical for temperature activated processes. The activation energy was determined to 27 meV, allowing an estimation of the breakdown field towards even higher temperatures. In negative field direction no breakdown occurred, which is attributed to the metal-insulator-semiconductor configuration of the sample and hence, the larger depletion layer forming in the silicon dominates the observed current behavior.

  4. Infrared Dielectric Properties of Low-stress Silicon Nitride

    NASA Technical Reports Server (NTRS)

    Cataldo, Giuseppe; Beall, James A.; Cho, Hsiao-Mei; McAndrew, Brendan; Niemack, Michael D.; Wollack, Edward J.

    2012-01-01

    Silicon nitride thin films play an important role in the realization of sensors, filters, and high-performance circuits. Estimates of the dielectric function in the far- and mid-IR regime are derived from the observed transmittance spectra for a commonly employed low-stress silicon nitride formulation. The experimental, modeling, and numerical methods used to extract the dielectric parameters with an accuracy of approximately 4% are presented.

  5. Boron nitride as two dimensional dielectric: Reliability and dielectric breakdown

    SciTech Connect

    Ji, Yanfeng; Pan, Chengbin; Hui, Fei; Shi, Yuanyuan; Lanza, Mario; Zhang, Meiyun; Long, Shibing; Lian, Xiaojuan; Miao, Feng; Larcher, Luca; Wu, Ernest

    2016-01-04

    Boron Nitride (BN) is a two dimensional insulator with excellent chemical, thermal, mechanical, and optical properties, which make it especially attractive for logic device applications. Nevertheless, its insulating properties and reliability as a dielectric material have never been analyzed in-depth. Here, we present the first thorough characterization of BN as dielectric film using nanoscale and device level experiments complementing with theoretical study. Our results reveal that BN is extremely stable against voltage stress, and it does not show the reliability problems related to conventional dielectrics like HfO{sub 2}, such as charge trapping and detrapping, stress induced leakage current, and untimely dielectric breakdown. Moreover, we observe a unique layer-by-layer dielectric breakdown, both at the nanoscale and device level. These findings may be of interest for many materials scientists and could open a new pathway towards two dimensional logic device applications.

  6. Scattering from Thin Dielectric Disks

    NASA Technical Reports Server (NTRS)

    Levine, D. M.; Schneider, A.; Lang, R. H.; Carter, H. G.

    1984-01-01

    A solution was obtained for scattering from thin dielectric disks by approximating the currents induced inside the disk with the currents which would exist inside a dielectric slab of the same thickness, orientation and dielectric properties. This approximation reduces to an electrostatic approximation when the disk thickness, T, is small compared to the wavelength of the incident radiation and the approximation yields a conventional physical optics solution when the dimension, A, characteristic of the geometrical cross section of the disk (e.g., the diameter of a circular disk) is large compared to wavelength. When the ratio A/T is sufficiently large the disk will always be in one or the other of these regimes (T lambda or kA1. Consequently, when A/T is large this solution provides a conventional approximation for the scattered fields which can be applied at all frequencies. As a check on this conclusion, a comparison was made between the theoretical and measured radar cross section of thin dielectric disks. Agreement was found for thin disks with both large and small values of kA.

  7. Scattering from thin dielectric disks

    NASA Technical Reports Server (NTRS)

    Le Vine, D. M.; Schneider, A.; Lang, R. H.; Carter, H. G.

    1985-01-01

    A solution was obtained for scattering from thin dielectric disks by approximating the currents induced inside the disk with the currents which would exist inside a dielectric slab of the same thickness, orientation and dielectic properties. This approximation reduces to an electrostatic approximation when the disk thickness, T, is small compared to the wavelength of the incident radiation and the approximation yields a conventional physical optics solution when the dimension, A, characteristic of the geometrical cross section of the disk (e.g., the diameter of a circular disk) is large compared to wavelength. When the ratio A/T sufficiently large the disk will always be in one or the other of these regimes, T lambda or kA1. Consequently, when A/T is large this solution provides a conventional approximation for the scattered fields which can be applied at all frequencies. As a check on this conclusion, a comparison was made between the theoretical and measured radar cross section of thin dielectric disks. Agreement was found for thin disks with both large and small values of kA.

  8. Solution-Processed Dielectrics Based on Thickness-Sorted Two-Dimensional Hexagonal Boron Nitride Nanosheets.

    PubMed

    Zhu, Jian; Kang, Joohoon; Kang, Junmo; Jariwala, Deep; Wood, Joshua D; Seo, Jung-Woo T; Chen, Kan-Sheng; Marks, Tobin J; Hersam, Mark C

    2015-10-14

    Gate dielectrics directly affect the mobility, hysteresis, power consumption, and other critical device metrics in high-performance nanoelectronics. With atomically flat and dangling bond-free surfaces, hexagonal boron nitride (h-BN) has emerged as an ideal dielectric for graphene and related two-dimensional semiconductors. While high-quality, atomically thin h-BN has been realized via micromechanical cleavage and chemical vapor deposition, existing liquid exfoliation methods lack sufficient control over h-BN thickness and large-area film quality, thus limiting its use in solution-processed electronics. Here, we employ isopycnic density gradient ultracentrifugation for the preparation of monodisperse, thickness-sorted h-BN inks, which are subsequently layer-by-layer assembled into ultrathin dielectrics with low leakage currents of 3 × 10(-9) A/cm(2) at 2 MV/cm and high capacitances of 245 nF/cm(2). The resulting solution-processed h-BN dielectric films enable the fabrication of graphene field-effect transistors with negligible hysteresis and high mobilities up to 7100 cm(2) V(-1) s(-1) at room temperature. These h-BN inks can also be used as coatings on conventional dielectrics to minimize the effects of underlying traps, resulting in improvements in overall device performance. Overall, this approach for producing and assembling h-BN dielectric inks holds significant promise for translating the superlative performance of two-dimensional heterostructure devices to large-area, solution-processed nanoelectronics.

  9. Titanium nitride thin films for minimizing multipactoring

    DOEpatents

    Welch, Kimo M.

    1979-01-01

    Applying a thin film coating to the surface of a workpiece, in particular, applying a coating of titanium nitride to a klystron window by means of a crossed-field diode sputtering array. The array is comprised of a cohesive group of numerous small hollow electrically conducting cylinders and is mounted so that the open ends of the cylinders on one side of the group are adjacent a titanium cathode plate. The workpiece is mounted so as to face the open ends of the other side of the group. A magnetic field is applied to the array so as to be coaxial with the cylinders and a potential is applied across the cylinders and the cathode plate, the cylinders as an anode being positive with respect to the cathode plate. The cylinders, the cathode plate and the workpiece are situated in an atmosphere of nitrogen which becomes ionized such as by field emission because of the electric field between the cylinders and cathode plate, thereby establishing an anode-cathode discharge that results in sputtering of the titanium plate. The sputtered titanium coats the workpiece and chemically combines with the nitrogen to form a titanium nitride coating on the workpiece. Gas pressure, gas mixtures, cathode material composition, voltages applied to the cathode and anode, the magnetic field, cathode, anode and workpiece spacing, and the aspect ratio (ratio of length to inner diameter) of the anode cylinders, all may be controlled to provide consistent optimum thin film coatings of various compositions and thicknesses. Another facet of the disclosure is the coating of microwave components per se with titanium nitride to reduce multipactoring under operating conditions of the components.

  10. Thin film dielectric composite materials

    DOEpatents

    Jia, Quanxi; Gibbons, Brady J.; Findikoglu, Alp T.; Park, Bae Ho

    2002-01-01

    A dielectric composite material comprising at least two crystal phases of different components with TiO.sub.2 as a first component and a material selected from the group consisting of Ba.sub.1-x Sr.sub.x TiO.sub.3 where x is from 0.3 to 0.7, Pb.sub.1-x Ca.sub.x TiO.sub.3 where x is from 0.4 to 0.7, Sr.sub.1-x Pb.sub.x TiO.sub.3 where x is from 0.2 to 0.4, Ba.sub.1-x Cd.sub.x TiO.sub.3 where x is from 0.02 to 0.1, BaTi.sub.1-x Zr.sub.x O.sub.3 where x is from 0.2 to 0.3, BaTi.sub.1-x Sn.sub.x O.sub.3 where x is from 0.15 to 0.3, BaTi.sub.1-x Hf.sub.x O.sub.3 where x is from 0.24 to 0.3, Pb.sub.1-1.3x La.sub.x TiO.sub.3+0.2x where x is from 0.23 to 0.3, (BaTiO.sub.3).sub.x (PbFeo.sub.0.5 Nb.sub.0.5 O.sub.3).sub.1-x where x is from 0.75 to 0.9, (PbTiO.sub.3).sub.- (PbCo.sub.0.5 W.sub.0.5 O.sub.3).sub.1-x where x is from 0.1 to 0.45, (PbTiO.sub.3).sub.x (PbMg.sub.0.5 W.sub.0.5 O.sub.3).sub.1-x where x is from 0.2 to 0.4, and (PbTiO.sub.3).sub.x (PbFe.sub.0.5 Ta.sub.0.5 O.sub.3).sub.1-x where x is from 0 to 0.2, as the second component is described. The dielectric composite material can be formed as a thin film upon suitable substrates.

  11. Device performance of in situ steam generated gate dielectric nitrided by remote plasma nitridation

    NASA Astrophysics Data System (ADS)

    Al-Shareef, H. N.; Karamcheti, A.; Luo, T. Y.; Bersuker, G.; Brown, G. A.; Murto, R. W.; Jackson, M. D.; Huff, H. R.; Kraus, P.; Lopes, D.; Olsen, C.; Miner, G.

    2001-06-01

    In situ steam generated (ISSG) oxides have recently attracted interest for use as gate dielectrics because of their demonstrated reliability improvement over oxides formed by dry oxidation. [G. Minor, G. Xing, H. S. Joo, E. Sanchez, Y. Yokota, C. Chen, D. Lopes, and A. Balakrishna, Electrochem. Soc. Symp. Proc. 99-10, 3 (1999); T. Y. Luo, H. N. Al-Shareef, G. A. Brown, M. Laughery, V. Watt, A. Karamcheti, M. D. Jackson, and H. R. Huff, Proc. SPIE 4181, 220 (2000).] We show in this letter that nitridation of ISSG oxide using a remote plasma decreases the gate leakage current of ISSG oxide by an order of magnitude without significantly degrading transistor performance. In particular, it is shown that the peak normalized transconductance of n-channel devices with an ISSG oxide gate dielectric decreases by only 4% and the normalized drive current by only 3% after remote plasma nitridation (RPN). In addition, it is shown that the reliability of the ISSG oxide exhibits only a small degradation after RPN. These observations suggest that the ISSG/RPN process holds promise for gate dielectric applications.

  12. Vertical III-nitride thin-film power diode

    DOEpatents

    Wierer, Jr., Jonathan; Fischer, Arthur J.; Allerman, Andrew A.

    2017-03-14

    A vertical III-nitride thin-film power diode can hold off high voltages (kV's) when operated under reverse bias. The III-nitride device layers can be grown on a wider bandgap template layer and growth substrate, which can be removed by laser lift-off of the epitaxial device layers grown thereon.

  13. Layer-by-layer dielectric breakdown of hexagonal boron nitride.

    PubMed

    Hattori, Yoshiaki; Taniguchi, Takashi; Watanabe, Kenji; Nagashio, Kosuke

    2015-01-27

    Hexagonal boron nitride (BN) is widely used as a substrate and gate insulator for two-dimensional (2D) electronic devices. The studies on insulating properties and electrical reliability of BN itself, however, are quite limited. Here, we report a systematic investigation of the dielectric breakdown characteristics of BN using conductive atomic force microscopy. The electric field strength was found to be ∼ 12 MV/cm, which is comparable to that of conventional SiO2 oxides because of the covalent bonding nature of BN. After the hard dielectric breakdown, the BN fractured like a flower into equilateral triangle fragments. However, when the applied voltage was terminated precisely in the middle of the dielectric breakdown, the formation of a hole that did not penetrate to the bottom metal electrode was clearly observed. Subsequent I-V measurements of the hole indicated that the BN layer remaining in the hole was still electrically inactive. On the basis of these observations, layer-by-layer breakdown was confirmed for BN with regard to both physical fracture and electrical breakdown. Moreover, statistical analysis of the breakdown voltages using a Weibull plot suggested the anisotropic formation of defects. These results are unique to layered materials and unlike the behavior observed for conventional 3D amorphous oxides.

  14. Hexagonal boron nitride: Ubiquitous layered dielectric for two-dimensional electronics

    NASA Astrophysics Data System (ADS)

    Jain, Nikhil

    Hexagonal boron nitride (h-BN), a layer-structured dielectric with very similar crystalline lattice to that of graphene, has been studied as a ubiquitous dielectric for two-dimensional electronics. While 2D materials may lead to future platform for electronics, traditional thin-film dielectrics (e.g., various oxides) make highly invasive interface with graphene. Multiple key roles of h-BN in graphene electronics are explored in this thesis. 2D graphene/h-BN heterostructures are designed and implemented in diverse configurations in which h-BN is evaluated as a supporting substrate, a gate dielectric, a passivation layer, or an interposing barrier in "3D graphene" superlattice. First, CVD-grown graphene on h-BN substrate shows improved conductivity and resilience to thermally induced breakdown, as compared with graphene on SiO2, potentially useful for high-speed graphene devices and on-chip interconnects. h-BN is also explored as a gate dielectric for graphene field-effect transistor with 2D heterostructure design. The dielectric strength and tunneling behavior of h-BN are investigated, confirming its robust nature. Next, h-BN is studied as a passivation layer for graphene electronics. In addition to significant improvement in current density and breakdown threshold, fully encapsulated graphene exhibits minimal environmental sensitivity, a key benefit to 2D materials which have only surfaces. Lastly, reduction in interlayer carrier scattering is observed in a double-layered graphene setup with ultrathin h-BN multilayer as an interposing layer. The DFT simulation and Raman spectral analysis indicate reduction in interlayer scattering. The decoupling of the two graphene monolayers is further confirmed by electrical characterization, as compared with other referencing mono- and multilayer configurations. The heterostructure serves as the building element in "3D graphene", a versatile platform for future electronics.

  15. Charge trapping in nitrided HfSiO gate dielectric layers

    SciTech Connect

    Vellianitis, G.; Rittersma, Z. M.; Petry, J.

    2006-08-28

    The effects of HfSiO nitridation on charge trapping and long-term dielectric reliability are investigated. A comparison between decoupled plasma nitridation, annealing in NH{sub 3}, and no nitridation is made. It was found that thinner HfSiO layers show less trapped charge. Decoupled plasma nitridation resulted always in a larger hysteresis in the characteristics. A common behavior in all samples was seen at elevated temperatures, which corresponds to lower trapped charge and higher leakage current. Dependence between the trapped charge and the leakage current changes with temperature was established.

  16. Approaching Defect-free Amorphous Silicon Nitride by Plasma-assisted Atomic Beam Deposition for High Performance Gate Dielectric.

    PubMed

    Tsai, Shu-Ju; Wang, Chiang-Lun; Lee, Hung-Chun; Lin, Chun-Yeh; Chen, Jhih-Wei; Shiu, Hong-Wei; Chang, Lo-Yueh; Hsueh, Han-Ting; Chen, Hung-Ying; Tsai, Jyun-Yu; Lu, Ying-Hsin; Chang, Ting-Chang; Tu, Li-Wei; Teng, Hsisheng; Chen, Yi-Chun; Chen, Chia-Hao; Wu, Chung-Lin

    2016-06-21

    In the past few decades, gate insulators with a high dielectric constant (high-k dielectric) enabling a physically thick but dielectrically thin insulating layer, have been used to replace traditional SiOx insulator and to ensure continuous downscaling of Si-based transistor technology. However, due to the non-silicon derivative natures of the high-k metal oxides, transport properties in these dielectrics are still limited by various structural defects on the hetero-interfaces and inside the dielectrics. Here, we show that another insulating silicon compound, amorphous silicon nitride (a-Si3N4), is a promising candidate of effective electrical insulator for use as a high-k dielectric. We have examined a-Si3N4 deposited using the plasma-assisted atomic beam deposition (PA-ABD) technique in an ultra-high vacuum (UHV) environment and demonstrated the absence of defect-related luminescence; it was also found that the electronic structure across the a-Si3N4/Si heterojunction approaches the intrinsic limit, which exhibits large band gap energy and valence band offset. We demonstrate that charge transport properties in the metal/a-Si3N4/Si (MNS) structures approach defect-free limits with a large breakdown field and a low leakage current. Using PA-ABD, our results suggest a general strategy to markedly improve the performance of gate dielectric using a nearly defect-free insulator.

  17. Approaching Defect-free Amorphous Silicon Nitride by Plasma-assisted Atomic Beam Deposition for High Performance Gate Dielectric

    PubMed Central

    Tsai, Shu-Ju; Wang, Chiang-Lun; Lee, Hung-Chun; Lin, Chun-Yeh; Chen, Jhih-Wei; Shiu, Hong-Wei; Chang, Lo-Yueh; Hsueh, Han-Ting; Chen, Hung-Ying; Tsai, Jyun-Yu; Lu, Ying-Hsin; Chang, Ting-Chang; Tu, Li-Wei; Teng, Hsisheng; Chen, Yi-Chun; Chen, Chia-Hao; Wu, Chung-Lin

    2016-01-01

    In the past few decades, gate insulators with a high dielectric constant (high-k dielectric) enabling a physically thick but dielectrically thin insulating layer, have been used to replace traditional SiOx insulator and to ensure continuous downscaling of Si-based transistor technology. However, due to the non-silicon derivative natures of the high-k metal oxides, transport properties in these dielectrics are still limited by various structural defects on the hetero-interfaces and inside the dielectrics. Here, we show that another insulating silicon compound, amorphous silicon nitride (a-Si3N4), is a promising candidate of effective electrical insulator for use as a high-k dielectric. We have examined a-Si3N4 deposited using the plasma-assisted atomic beam deposition (PA-ABD) technique in an ultra-high vacuum (UHV) environment and demonstrated the absence of defect-related luminescence; it was also found that the electronic structure across the a-Si3N4/Si heterojunction approaches the intrinsic limit, which exhibits large band gap energy and valence band offset. We demonstrate that charge transport properties in the metal/a-Si3N4/Si (MNS) structures approach defect-free limits with a large breakdown field and a low leakage current. Using PA-ABD, our results suggest a general strategy to markedly improve the performance of gate dielectric using a nearly defect-free insulator. PMID:27325155

  18. Catastrophic Thinning of Dielectric Elastomers

    NASA Astrophysics Data System (ADS)

    Zurlo, G.; Destrade, M.; DeTommasi, D.; Puglisi, G.

    2017-02-01

    We provide an energetic insight into the catastrophic nature of thinning instability in soft electroactive elastomers. This phenomenon is a major obstacle to the development of giant actuators, yet it is neither completely understood nor modeled accurately. In excellent agreement with experiments, we give a simple formula to predict the critical voltages for instability patterns; we model their shape and show that reversible (elastic) equilibrium is impossible beyond their onset. Our derivation is fully analytical, does not require finite element simulations, and can be extended to include prestretch and various material models.

  19. Cellulose triacetate, thin film dielectric capacitor

    NASA Technical Reports Server (NTRS)

    Yen, Shiao-Ping S. (Inventor); Jow, T. Richard (Inventor)

    1995-01-01

    Very thin films of cellulose triacetate are cast from a solution containing a small amount of high boiling temperature, non-solvent which evaporates last and lifts the film from the casting surface. Stretched, oriented, crystallized films have high electrical breakdown properties. Metallized films less than about 2 microns in thickness form self-healing electrodes for high energy density, pulsed power capacitors. Thicker films can be utilized as a dielectric for a capacitor.

  20. Cellulose triacetate, thin film dielectric capacitor

    NASA Technical Reports Server (NTRS)

    Yen, Shiao-Ping S. (Inventor); Jow, T. Richard (Inventor)

    1993-01-01

    Very thin films of cellulose triacetate are cast from a solution containing a small amount of high boiling temperature, non-solvent which evaporates last and lifts the film from the casting surface. Stretched, oriented, crystallized films have high electrical breakdown properties. Metallized films less than about 2 microns in thickness form self-healing electrodes for high energy density, pulsed power capacitors. Thicker films can be utilized as a dielectric for a capacitor.

  1. Dielectric response of wurtzite gallium nitride in the terahertz frequency range

    NASA Astrophysics Data System (ADS)

    Hibberd, M. T.; Frey, V.; Spencer, B. F.; Mitchell, P. W.; Dawson, P.; Kappers, M. J.; Oliver, R. A.; Humphreys, C. J.; Graham, D. M.

    2016-12-01

    We report on the characterization of the intrinsic, anisotropic, dielectric properties of wurtzite gallium nitride in the spectral range of 0.5-11 THz, using terahertz time-domain spectroscopy. The ordinary (ε˜⊥) and extraordinary (ε˜∥) components of the complex dielectric function were determined experimentally for a semi-insulating, m-plane gallium nitride single crystal, providing measurements of the refractive indices (n⊥,∥) and absorption coefficients (α⊥,∥) . These material parameters were successfully modeled by considering the contribution of the optical phonon modes, measured using Raman spectroscopy, to the dielectric function, giving values for the relative static dielectric constants of ε0⊥ = 9.22 ± 0.02 and ε0∥ = 10.32 ± 0.03 for wurtzite gallium nitride.

  2. Direct growth of nanocrystalline hexagonal boron nitride films on dielectric substrates

    SciTech Connect

    Tay, Roland Yingjie; Tsang, Siu Hon; Loeblein, Manuela; Chow, Wai Leong; Loh, Guan Chee; Toh, Joo Wah; Ang, Soon Loong; Teo, Edwin Hang Tong

    2015-03-09

    Atomically thin hexagonal-boron nitride (h-BN) films are primarily synthesized through chemical vapor deposition (CVD) on various catalytic transition metal substrates. In this work, a single-step metal-catalyst-free approach to obtain few- to multi-layer nanocrystalline h-BN (NCBN) directly on amorphous SiO{sub 2}/Si and quartz substrates is demonstrated. The as-grown thin films are continuous and smooth with no observable pinholes or wrinkles across the entire deposited substrate as inspected using optical and atomic force microscopy. The starting layers of NCBN orient itself parallel to the substrate, initiating the growth of the textured thin film. Formation of NCBN is due to the random and uncontrolled nucleation of h-BN on the dielectric substrate surface with no epitaxial relation, unlike on metal surfaces. The crystallite size is ∼25 nm as determined by Raman spectroscopy. Transmission electron microscopy shows that the NCBN formed sheets of multi-stacked layers with controllable thickness from ∼2 to 25 nm. The absence of transfer process in this technique avoids any additional degradation, such as wrinkles, tears or folding and residues on the film which are detrimental to device performance. This work provides a wider perspective of CVD-grown h-BN and presents a viable route towards large-scale manufacturing of h-BN substrates and for coating applications.

  3. Electroless plating of thin gold films directly onto silicon nitride thin films and into micropores.

    PubMed

    Whelan, Julie C; Karawdeniya, Buddini Iroshika; Bandara, Y M Nuwan D Y; Velleco, Brian D; Masterson, Caitlin M; Dwyer, Jason R

    2014-07-23

    A method to directly electrolessly plate silicon-rich silicon nitride with thin gold films was developed and characterized. Films with thicknesses <100 nm were grown at 3 and 10 °C between 0.5 and 3 h, with mean grain sizes between ∼20 and 30 nm. The method is compatible with plating free-standing ultrathin silicon nitride membranes, and we successfully plated the interior walls of micropore arrays in 200 nm thick silicon nitride membranes. The method is thus amenable to coating planar, curved, and line-of-sight-obscured silicon nitride surfaces.

  4. Optical dielectric response of gallium nitride studied by variable angle spectroscopy ellipsometry

    SciTech Connect

    Yao, H.; Yan, C.H.; Jenkinson, H.A.; Zavada, J.M.; Speck, J.S.; Denbaars, S.P.

    1997-12-31

    Variable angle spectroscopic ellipsometry (VASE) and transmission measurements have been employed to study the dielectric response of gallium nitride (GaN) thin films -- an important material for light emitting diodes (LEDs) and laser diodes applications. The GaN films were grown by atmosphere pressure metal organic chemical vapor deposition (MOCVD) on c-plane sapphire substrates ({alpha}-Al{sub 2}O{sub 3}). Room temperature VASE measurements were made, in the range of 0.75 to 5.5eV, at the angle of incidence of 73, 75, and 77 degree, respectively. Evidence of anisotropy is observed especially in the spectral range under the band gap ({approximately}3.4 eV), reflecting the nature of wurtzite crystal structure of GaN. The ordinary dielectric function {var_epsilon}{sub {perpendicular}}({omega}) of GaN were obtained through the analysis of transmission and VASE data in the range below and above the band gap. The thickness of these GaN films is also determined via the analysis.

  5. Electrical conduction mechanism in silicon nitride and oxy-nitride-sputtered thin films

    NASA Astrophysics Data System (ADS)

    Vila, M.; Román, E.; Prieto, C.

    2005-06-01

    We have studied the effect of reactive and nonreactive sputtering preparations on the composition and properties of silicon nitride thin films. Films were prepared from both silicon nitride ceramic and pure silicon targets under different Ar /N2 gas mixtures. For the different resulting samples, we have performed optical, x-ray photoemission spectroscopy (XPS), and transport measurements. The preparation conditions change the sample atomic composition and the effect of oxygen in the films, which in turn determines the dominant conduction mechanism. It becomes important to determine both the nonstoichiometry of the film and the phase where the oxygen is incorporated. Oxygen may appear as silicon oxide, forming a secondary phase inside silicon nitride; or it may consist of silicon oxy-nitride phases. The presence of these different phases, as revealed by XPS, determines the electrical properties and conduction mechanisms. Samples presenting space-charge-limited current as the dominant conduction mechanism correspond to those where a silicon oxy-nitride phase is formed (that becomes Ohmic for overstoichiometric Si content samples), while a Poole-Frenkel conduction behavior is characteristic of the silicon nitride phase.

  6. Nitrogen incorporation in sputter deposited molybdenum nitride thin films

    SciTech Connect

    Stöber, Laura Patocka, Florian Schneider, Michael Schmid, Ulrich; Konrath, Jens Peter Haberl, Verena

    2016-03-15

    In this paper, the authors report on the high temperature performance of sputter deposited molybdenum (Mo) and molybdenum nitride (Mo{sub 2}N) thin films. Various argon and nitrogen gas compositions are applied for thin film synthetization, and the amount of nitrogen incorporation is determined by Auger measurements. Furthermore, effusion measurements identifying the binding conditions of the nitrogen in the thin film are performed up to 1000 °C. These results are in excellent agreement with film stress and scanning electron microscope analyses, both indicating stable film properties up to annealing temperatures of 500 °C.

  7. Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride.

    PubMed

    Kischkat, Jan; Peters, Sven; Gruska, Bernd; Semtsiv, Mykhaylo; Chashnikova, Mikaela; Klinkmüller, Matthias; Fedosenko, Oliana; Machulik, Stephan; Aleksandrova, Anna; Monastyrskyi, Gregorii; Flores, Yuri; Masselink, W Ted

    2012-10-01

    The complex refractive index components, n and k, have been studied for thin films of several common dielectric materials with a low to medium refractive index as functions of wavelength and stoichiometry for mid-infrared (MIR) wavelengths within the range 1.54-14.29 μm (700-6500 cm(-1)). The materials silicon oxide, silicon nitride, aluminum oxide, aluminum nitride, and titanium oxide are prepared using room temperature reactive sputter deposition and are characterized using MIR variable angle spectroscopic ellipsometry. The investigation shows how sensitive the refractive index functions are to the O2 and N2 flow rates, and for which growth conditions the materials deposit homogeneously. It also allows conclusions to be drawn on the degree of amorphousness and roughness. To facilitate comparison of the materials deposited in this work with others, the index of refraction was also determined and provided for the near-IR and visible ranges of the spectrum. The results presented here should serve as a useful information base for designing optical coatings for the MIR part of the electromagnetic spectrum. The results are parameterized to allow them to be easily used for coating design.

  8. Reactive ion beam deposition of aluminum nitride thin films

    NASA Astrophysics Data System (ADS)

    Bhat, S.; Ashok, S.; Fonash, S. J.; Tongson}, L.

    1985-07-01

    Aluminum nitride thin films have been prepared at room temperature by reactive ion beam sputtering for potential use as a passivant and diffusion/anneal cap in compound semiconductor technology. The electrical and optical pro-perties of these films have been studied along with the in-fluence of thermal annealing on the material characteristics. The quality of the films has also been found to improve in the presence of atomic hydrogen during the deposition.

  9. Trapping of hydrogen in hafnium-based high kappa dielectric thin films for advanced CMOS applications

    NASA Astrophysics Data System (ADS)

    Ukirde, Vaishali

    In recent years, advanced high kappa gate dielectrics are under serious consideration to replace SiO2 and SiON in semiconductor industry. Hafnium-based dielectrics such as hafnium oxides, oxynitrides and Hf-based silicates/nitrided silicates are emerging as some of the most promising alternatives to SiO2/SiON gate dielectrics in complementary metal oxide semiconductor (CMOS) devices. Extensive efforts have been taken to understand the effects of hydrogen impurities in semiconductors and its behavior such as incorporation, diffusion, trapping and release with the aim of controlling and using it to optimize the performance of electronic device structures. In this dissertation, a systematic study of hydrogen trapping and the role of carbon impurities in various alternate gate dielectric candidates, HfO2/Si, HfxSi1-xO2/Si, HfON/Si and HfON(C)/Si is presented. It has been shown that processing of high kappa dielectrics may lead to some crystallization issues. Rutherford backscattering spectroscopy (RBS) for measuring oxygen deficiencies, elastic recoil detection analysis (ERDA) for quantifying hydrogen and nuclear reaction analysis (NRA) for quantifying carbon, X-ray diffraction (XRD) for measuring degree of crystallinity and X-ray photoelectron spectroscopy (XPS) were used to characterize these thin dielectric materials. ERDA data are used to characterize the evolution of hydrogen during annealing in hydrogen ambient in combination with preprocessing in oxygen and nitrogen.

  10. First-principles investigation of band offsets and dielectric properties of Silicon-Silicon Nitride interfaces

    NASA Astrophysics Data System (ADS)

    Pham, Tuan Anh; Li, Tianshu; Gygi, Francois; Galli, Giulia

    2011-03-01

    Silicon Nitride (Si3N4) is a possible candidate material to replace or be alloyed with SiO2 to form high-K dielectric films on Si substrates, so as to help prevent leakage currents in modern CMOS transistors. Building on our previous work on dielectric properties of crystalline and amorphous Si3N4 slabs, we present an analysis of the band offsets and dielectric properties of crystalline-Si/amorphous Si3N4 interfaces based on first principles calculations. We discuss shortcomings of the conventional bulk-plus line up approach in band offset calculations for systems with an amorphous component, and we present the results of band offsets obtained from calculations of local density of states. Finally, we describe the role of bonding configurations in determining band edges and dielectric constants at the interface. We acknowledge financial support from Intel Corporation.

  11. Carbon Nitride Thin Films Deposited by Cathodic Electrodeposition

    NASA Astrophysics Data System (ADS)

    Cao, Chuanbao; Fu, Jiyu; Zhu, Hesun

    Carbon nitride thin films were prepared by cathodic electrodeposition. The dicyandiamide compound dissovled in acetone was selected as the organic precursor. Single crystal silicon wafers and conductive glass (ITO) wafers were used as substrates. XPS measurements indicated that the films composed of carbon and nitrogen elements. The nitrogen content reached 41%. The polycrystalline β-C3N4 should exit in the prepared film from TED measurements. The nano hardness of the films on ITO substrates were as high as 13 GPa. The structure and properties were studies.

  12. Dynamic Properties of Dielectric Susceptibility in Ferroelectric Thin Films

    NASA Astrophysics Data System (ADS)

    Cui, Lian; Cui, Haiying; Wu, Chunmei; Yang, Guihua; He, Zelong; Wang, Yuling; Che, Jixin

    2016-02-01

    In this paper, frequency, temperature, film thickness, surface effects, and various parameters dependence of dielectric susceptibility is investigated theoretically for ferroelectric thin films by the modified Landau theory under an AC applied field. The dielectric susceptibility versus AC applied field shows butterfly-shaped behavior, and depends strongly on the frequency and amplitude of the field and temperature. Our study shows that the existence of the surface transition layer can depress the dielectric susceptibility of a ferroelectric thin film. These results are well consistent with the phenomena reported in experiments.

  13. Temperature effect on titanium nitride nanometer thin film in air

    NASA Astrophysics Data System (ADS)

    Cen, Z. H.; Xu, B. X.; Hu, J. F.; Ji, R.; Toh, Y. T.; Ye, K. D.; Hu, Y. F.

    2017-02-01

    Titanium nitride (TiN) is a promising alternative plasmonic material to conventional novel metals. For practical plasmonic applications under the influence of air, the temperature-dependent optical properties of TiN thin films in air and its volume variation are essential. Ellipsometric characterizations on a TiN thin film at different increasing temperatures in ambient air were conducted, and optical constants along with film thickness were retrieved. Below 200 °C, the optical properties varied linearly with temperature, in good agreement with other temperature dependent studies of TiN films in vacuum. The thermal expansion coefficient of the TiN thin film was determined to be 10.27  ×  10‑6 °C‑1. At higher temperatures, the TiN thin film gradually loses its metallic characteristics and has weaker optical absorption, impairing its plasmonic performance. In addition, a sharp increase in film thickness was observed at the same time. Changes in the optical properties and film thickness with temperatures above 200 °C were revealed to result from TiN oxidation in air. For the stability of TiN-based plasmonic devices, operation temperatures of lower than 200 °C, or measures to prevent oxidation, are required. The present study is important to fundamental physics and technological applications of TiN thin films.

  14. Anisotropic Dielectric Breakdown Strength of Single Crystal Hexagonal Boron Nitride.

    PubMed

    Hattori, Yoshiaki; Taniguchi, Takashi; Watanabe, Kenji; Nagashio, Kosuke

    2016-10-11

    Dielectric breakdown has historically been of great interest from the perspectives of fundamental physics and electrical reliability. However, to date, the anisotropy in the dielectric breakdown has not been discussed. Here, we report an anisotropic dielectric breakdown strength (EBD) for h-BN, which is used as an ideal substrate for two-dimensional (2D) material devices. Under a well-controlled relative humidity, EBD values in the directions both normal and parallel to the c axis (EBD⊥c and EBD∥c) were measured to be 3 and 12 MV/cm, respectively. When the crystal structure is changed from sp(3) of cubic-BN (c-BN) to sp(2) of h-BN, EBD⊥c for h-BN becomes smaller than that for c-BN, while EBD∥c for h-BN drastically increases. Therefore, h-BN can possess a relatively high EBD concentrated only in the direction parallel to the c axis by conceding a weak bonding direction in the highly anisotropic crystal structure. This explains why the EBD∥c for h-BN is higher than that for diamond. Moreover, the presented EBD value obtained from the high quality bulk h-BN crystal can be regarded as the standard for qualifying the crystallinity of h-BN layers grown via chemical vapor deposition for future electronic applications.

  15. Investigation of temperature dependent dielectric constant of a sputtered TiN thin film by spectroscopic ellipsometry

    SciTech Connect

    Tripura Sundari, S. Ramaseshan, R.; Jose, Feby; Dash, S.; Tyagi, A. K.

    2014-01-21

    The temperature dependence of optical constants of titanium nitride thin film is investigated using Spectroscopic Ellipsometry (SE) between 1.4 and 5 eV in the temperature range of 300 K to 650 K in steps of 50 K. The real and imaginary parts of the dielectric functions ε{sub 1}(E) and ε{sub 2}(E) marginally increase with increase in temperature. A Drude Lorentz dielectric analysis based on free electron and oscillator model are carried out to describe the temperature behavior. With increase in temperature, the unscreened plasma frequency and broadening marginally decreased and increased, respectively. The parameters of the Lorentz oscillator model also showed that the relaxation time decreased with temperature while the oscillator energies increased. This study shows that owing to the marginal change in the refractive index with temperature, titanium nitride can be employed for surface plasmon sensor applications even in environments where rise in temperature is imminent.

  16. Reactive pulsed laser deposition of gold nitride thin films

    NASA Astrophysics Data System (ADS)

    Caricato, A. P.; Fernàndez, M.; Leggieri, G.; Luches, A.; Martino, M.; Romano, F.; Tunno, T.; Valerini, D.; Verdyan, A.; Soifer, Y. M.; Azoulay, J.; Meda, L.

    2007-07-01

    We report on the growth and characterization of gold nitride thin films on Si <1 0 0> substrates at room temperature by reactive pulsed laser ablation. A pure (99.95%) Au target was ablated with KrF excimer laser pulses in nitrogen containing atmosphere (N 2 or NH 3). The gas ambient pressure was varied in the range 0.1-100 Pa. The morphology of the films was studied by using optical, scanning electron and atomic force microscopy, evidencing compact films with RMS roughness in the range 3.6-35.1 nm, depending on the deposition pressure. Rutherford backscattering spectrometry and energy dispersion spectroscopy (EDS) were used to detect the nitrogen concentration into the films. The EDS nitrogen peak does not decrease in intensity after 2 h annealing at 250 °C. Film resistivity was measured using a four-point probe and resulted in the (4-20) × 10 -8 Ω m range, depending on the ambient pressure, to be compared with the value 2.6 × 10 -8 Ω m of a pure gold film. Indentation and scratch measurements gave microhardness values of 2-3 GPa and the Young's modulus close to 100 GPa. X-ray photoemission spectra clearly showed the N 1s peak around 400 eV and displaced with respect to N 2 phase. All these measurements point to the formation of the gold nitride phase.

  17. Anisotropies in magnetron sputtered carbon nitride thin films

    NASA Astrophysics Data System (ADS)

    Hellgren, Niklas; Johansson, Mats P.; Broitman, Esteban; Hultman, Lars; Sundgren, Jan-Eric

    2001-04-01

    Carbon nitride CNx (0⩽x⩽0.35) thin films, deposited by reactive dc magnetron sputtering in Ar/N2 discharges have been studied with respect to microstructure using electron microscopy, and elastic modulus using nanoindentation and surface acoustic wave analyses. For growth temperature of 100 °C, the films were amorphous, and with an isotropic Young's modulus of ˜170-200 GPa essentially unaffected by the nitrogen fraction. The films grown at elevated temperatures (350-550 °C) show anisotropic mechanical properties due to a textured microstructure with standing basal planes, as observed from measuring the Young's modulus in different directions. The modulus measured in the plane of the film was ˜60-80 GPa, while in the vertical direction the modulus increased considerably from ˜25 to ˜200 GPa as the nitrogen content was increased above ˜15 at. %.

  18. The electrical breakdown of thin dielectric elastomers: thermal effects

    NASA Astrophysics Data System (ADS)

    Zakaria, Shamsul; Morshuis, Peter H. F.; Benslimane, Mohamed Y.; Gernaey, Krist V.; Skov, Anne L.

    2014-03-01

    Dielectric elastomers are being developed for use in actuators, sensors and generators to be used in various applications, such as artificial eye lids, pressure sensors and human motion energy generators. In order to obtain maximum efficiency, the devices are operated at high electrical fields. This increases the likelihood for electrical breakdown significantly. Hence, for many applications the performance of the dielectric elastomers is limited by this risk of failure, which is triggered by several factors. Amongst others thermal effects may strongly influence the electrical breakdown strength. In this study, we model the electrothermal breakdown in thin PDMS based dielectric elastomers in order to evaluate the thermal mechanisms behind the electrical failures. The objective is to predict the operation range of PDMS based dielectric elastomers with respect to the temperature at given electric field. We performed numerical analysis with a quasi-steady state approximation to predict thermal runaway of dielectric elastomer films. We also studied experimentally the effect of temperature on dielectric properties of different PDMS dielectric elastomers. Different films with different percentages of silica and permittivity enhancing filler were selected for the measurements. From the modeling based on the fitting of experimental data, it is found that the electrothermal breakdown of the materials is strongly influenced by the increase in both dielectric permittivity and conductivity.

  19. Method of manufacture of atomically thin boron nitride

    SciTech Connect

    Zettl, Alexander K

    2013-08-06

    The present invention provides a method of fabricating at least one single layer hexagonal boron nitride (h-BN). In an exemplary embodiment, the method includes (1) suspending at least one multilayer boron nitride across a gap of a support structure and (2) performing a reactive ion etch upon the multilayer boron nitride to produce the single layer hexagonal boron nitride suspended across the gap of the support structure. The present invention also provides a method of fabricating single layer hexagonal boron nitride. In an exemplary embodiment, the method includes (1) providing multilayer boron nitride suspended across a gap of a support structure and (2) performing a reactive ion etch upon the multilayer boron nitride to produce the single layer hexagonal boron nitride suspended across the gap of the support structure.

  20. Technique for measuring the dielectric constant of thin materials

    NASA Technical Reports Server (NTRS)

    Sarabandi, K.; Ulaby, F. T.

    1988-01-01

    A practical technique for measuring the dielectric constant of vegetation leaves and similarly thin materials is presented. A rectangular section of the leaf is placed in the tranverse plane in a rectangular waveguide and the magnitude and phase of the reflection coefficient are measured over the desired frequency band using a vector network analyzer. By treating the leaf as an infinitesimally thin resistive sheet, an explicit expression for its dielectric constant is obtained in terms of the reflection coefficient. Because of the thin-sheet approximation, however, this approach is valid only at frequencies below 1.5 GHz. To extend the technique to higher frequencies, higher order approximations are derived and their accuracies are compared to the exact dielectric-slab solution. For a material whose thickness is 0.5 mm or less, the proposed technique was found to provide accurate values of its dielectric constant up to frequencies of 12 GHz or higher. The technique was used to measure the 8 to 12 GHz dielectric spectrum for vegetation leaves, teflon and rock samples.

  1. Plasmonic versus dielectric enhancement in thin-film solar cells

    NASA Astrophysics Data System (ADS)

    Dühring, Maria B.; Asger Mortensen, N.; Sigmund, Ole

    2012-05-01

    Several studies have indicated that broadband absorption of thin-film solar cells can be enhanced by use of surface-plasmon induced resonances of metallic parts like strips or particles. The metallic parts may create localized modes or scatter incoming light to increase absorption in thin-film semiconducting material. For a particular case, we show that coupling to the same type of localized slab-waveguide modes can be obtained by a surface modulation consisting of purely dielectric strips. The purely dielectric device turns out to have a significantly higher broadband enhancement factor compared to its metallic counterpart. We show that the enhanced normalized short-circuit current for a cell with silicon strips can be increased 4 times compared to the best performance for strips of silver, gold, or aluminium. For this particular case, the simple dielectric grating may outperform its plasmonic counterpart due to the larger Ohmic losses associated with the latter.

  2. Dielectric properties of inorganic fillers filled epoxy thin film

    NASA Astrophysics Data System (ADS)

    Norshamira, A.; Mariatti, M.

    2015-07-01

    The demand on the small size and high performance electronics has driven changes in the electronic packaging requirements from discrete capacitor to embedded capacitor. Embedded capacitor can improve electrical performance compared with discrete capacitor. This study aimed to achieve high dielectric of epoxy thin film composite that were targeted for application as embedded capacitor. In this study, inorganic fillers such as Calcium Copper Titanate (CCTO), Iron(III) Oxide (Fe2O3) and Titanium Dioxide (TiO2) were loaded in epoxy system at 5 and 20vol%. Morphology and dielectric properties were investigated to identify the effect of fillers loading and types of fillers on the properties of epoxy thin film composite. Based on the study, CCTO with 20vol% loading was found to have good dielectric properties compared to other type of fillers.

  3. Dielectric properties of inorganic fillers filled epoxy thin film

    SciTech Connect

    Norshamira, A. Mariatti, M.

    2015-07-22

    The demand on the small size and high performance electronics has driven changes in the electronic packaging requirements from discrete capacitor to embedded capacitor. Embedded capacitor can improve electrical performance compared with discrete capacitor. This study aimed to achieve high dielectric of epoxy thin film composite that were targeted for application as embedded capacitor. In this study, inorganic fillers such as Calcium Copper Titanate (CCTO), Iron(III) Oxide (Fe{sub 2}O{sub 3}) and Titanium Dioxide (TiO{sub 2}) were loaded in epoxy system at 5 and 20vol%. Morphology and dielectric properties were investigated to identify the effect of fillers loading and types of fillers on the properties of epoxy thin film composite. Based on the study, CCTO with 20vol% loading was found to have good dielectric properties compared to other type of fillers.

  4. Electron transport and dielectric breakdown in silicon nitride using a charge transport model

    NASA Astrophysics Data System (ADS)

    Ogden, Sean P.; Lu, Toh-Ming; Plawsky, Joel L.

    2016-10-01

    Silicon nitride is an important material used in the electronics industry. As such, the electronic transport and reliability of these materials are important to study and understand. We report on a charge transport model to predict leakage current and failure trends based on previously published data for a stoichiometric silicon nitride dielectric. Failure occurs when the defect density increases to a critical value of approximately 6 × 1025 traps/m3. The model's parameters are determined using voltage ramp data only, and yet, the model is also able to predict constant voltage stress failure over a time scale ranging from minutes to months. The successful fit of the model to the experimental data validates our assumption that the dominant defect in the dielectric is the Si dangling bond, located approximately 2.2 eV below the conduction band. A comparison with previous SiCOH simulations shows SiN and SiCOH have similar defect-related material properties. It is also speculated that, based on the estimated parameter values of 2.75 eV for the defect formation activation energy, the materials' TDDB wear-out are caused by broken Si-H bonds, resulting in Si dangling bond defects.

  5. Residual ferroelectricity in barium strontium titanate thin film tunable dielectrics

    SciTech Connect

    Garten, L. M. Trolier-McKinstry, S.; Lam, P.; Harris, D.; Maria, J.-P.

    2014-07-28

    Loss reduction is critical to develop Ba{sub 1−x}Sr{sub x}TiO{sub 3} thin film tunable microwave dielectric components and dielectric energy storage devices. The presence of ferroelectricity, and hence the domain wall contributions to dielectric loss, will degrade the tunable performance in the microwave region. In this work, residual ferroelectricity—a persistent ferroelectric response above the global phase transition temperature—was characterized in tunable dielectrics using Rayleigh analysis. Chemical solution deposited Ba{sub 0.7}Sr{sub 0.3}TiO{sub 3} films, with relative tunabilities of 86% over 250 kV/cm at 100 kHz, demonstrated residual ferroelectricity 65 °C above the ostensible paraelectric transition temperature. Frequency dispersion observed in the dielectric temperature response was consistent with the presence of nanopolar regions as one source of residual ferroelectricity. The application of AC electric field for the Rayleigh analysis of these samples led to a doubling of the dielectric loss for fields over 10 kV/cm at room temperature.

  6. The thickness dependence of dielectric permittivity in thin films

    NASA Astrophysics Data System (ADS)

    Starkov, Ivan A.; Starkov, Alexander S.

    2016-08-01

    It is well known that the physical properties of thin films depend on their thickness. For a description of such dependences, it is proposed to use a classical model taking into account the presence of film interfaces. A dielectric ball near the half-space was chosen to adopt the approach. The dependence of the effective permittivity of the ball on geometrical and physical parameters of the system is analyzed. It is demonstrated that the dielectric constant of a film can be presented as a sum of the constant of a bulk material and the interface term.

  7. Ellipsometric study of silicon nitride on gallium arsenide

    NASA Technical Reports Server (NTRS)

    Alterovitz, S. A.; Bu-Abbud, G. H.; Woollam, J. A.; Liu, D.; Chung, Y.; Langer, D.

    1982-01-01

    A method for optimizing the sensitivity of ellipsometric measurements for thin dielectric films on semiconductors is described in simple physical terms. The technique is demonstrated for the case of sputtered silicon nitride films on gallium arsenide.

  8. Dielectric and Optical Properties of Thin Films.

    DTIC Science & Technology

    1978-08-01

    Is const ructed from a thin slice of bismuth silicon oxlde,~ a cubic crystal exhibiting the Pockels effect. The crystal also is photoconductive when... Photoconductive diameter electro -optical crystal ~~~~~~~~~~~~~~~~~ i12SiO20) Electrode 2 Insulator layer Electrode 1 (paralene) Figure 1-1

  9. Micromachined ultrasonic transducers with piezoelectric aluminum nitride thin films

    NASA Astrophysics Data System (ADS)

    Wang, Qianghua

    In this research, a laboratory prototype of micromachined ultrasonic transducer (MUT) has been designed and fabricated with the application of piezoelectric aluminum nitride (AlN) thin films. The fabrication process of MUT device, especially the deposition of AlN thin film, is compatible with a standard integrated circuits (IC) technology. Preliminary results have demonstrated the feasibility of AlN thin film applied in MUT for medical ultrasonic detection. AlN thin film was grown on aluminum metal layer by plasma source molecular beam epitaxy (PSMBE) system. X-ray diffraction (XRD) shows the films exhibit a high c-axis texture for a thickness of 1.2 mum grown at a temperature of 450°C. For the AlN film of 1.20 mum, residual stress was a compressive stress of 883 Mpa, which reduced with increasing thickness of the film. Based on the fundamentals of vibration and piezoelectricity, MUT device including silicon resonator and AlN sandwich structure has been designed. A prototype of 8 x 8 devices on a 3″ silicon (100) wafer has been fabricated. A series of experiments were conducted to find the process flow and the optimum process parameters. MUT devices were characterized by optical, electrical, and acoustic measurements. The measured resonant frequencies AlN MUT and PVDF MUT devices were larger than the calculated value in order of 5% to 12%. The ratios of the flexural frequencies to the fundamental frequency were much close to the MUT design model within a 3% error for AlN MUT devices. Resonant frequencies of AlN MUT devices were also verified by the reflection coefficient with a network analyzer and the electrical impedance with an impendence analyzer. Effective coupling factors of AlN MUT devices were determined to be 0.18 from the resonant frequency and the antiresonant frequency. Fractional bandwidth of an AlN MUT was 8.30% at the center frequency of 2.65 MHz. Pressure sensitivity was stable between 14 mV/MPa and 18 mV/MPa independent on the pressure intensity

  10. Thin film transistors for flexible electronics: contacts, dielectrics and semiconductors.

    PubMed

    Quevedo-Lopez, M A; Wondmagegn, W T; Alshareef, H N; Ramirez-Bon, R; Gnade, B E

    2011-06-01

    The development of low temperature, thin film transistor processes that have enabled flexible displays also present opportunities for flexible electronics and flexible integrated systems. Of particular interest are possible applications in flexible sensor systems for unattended ground sensors, smart medical bandages, electronic ID tags for geo-location, conformal antennas, radiation detectors, etc. In this paper, we review the impact of gate dielectrics, contacts and semiconductor materials on thin film transistors for flexible electronics applications. We present our recent results to fully integrate hybrid complementary metal oxide semiconductors comprising inorganic and organic-based materials. In particular, we demonstrate novel gate dielectric stacks and semiconducting materials. The impact of source and drain contacts on device performance is also discussed.

  11. Vertically self-ordered orientation of nanocrystalline hexagonal boron nitride thin films for enhanced thermal characteristics.

    PubMed

    Cometto, Olivier; Sun, Bo; Tsang, Siu Hon; Huang, Xi; Koh, Yee Kan; Teo, Edwin Hang Tong

    2015-12-07

    Vertically self-ordered hexagonal boron nitride (ordered h-BN) is a highly ordered turbostratic BN (t-BN) material similar to hexagonal BN, with its planar structure perpendicularly oriented to the substrate. The ordered h-BN thin films were grown using a High Power Impulse Magnetron Sputtering (HiPIMS) system with a lanthanum hexaboride (LaB6) target reactively sputtered in nitrogen gas. The best vertical alignment was obtained at room temperature, with a grounded bias and a HiPIMS peak power density of 60 W cm(-2). Even though the film contains up to 7.5 at% lanthanum, it retains its highly insulative properties and it was observed that an increase in compressive stress is correlated to an increase in film ordering quality. Importantly, the thermal conductivity of vertically ordered h-BN is considerably high at 5.1 W m(-1) K(-1). The favourable thermal conductivity coupled with the dielectric properties of this novel material and the low temperature growth could outperform SiO2 in high power density electronic applications.

  12. Low Temperature Reactive Sputtering of Thin Aluminum Nitride Films on Metallic Nanocomposites

    PubMed Central

    Ramadan, Khaled Sayed Elbadawi; Evoy, Stephane

    2015-01-01

    Piezoelectric aluminum nitride thin films were deposited on aluminum-molybdenum (AlMo) metallic nanocomposites using reactive DC sputtering at room temperature. The effect of sputtering parameters on film properties was assessed. A comparative study between AlN grown on AlMo and pure aluminum showed an equivalent (002) crystallographic texture. The piezoelectric coefficients were measured to be 0.5±0.1 C m-2 and 0.9±0.1 C m-2, for AlN deposited on Al/0.32Mo and pure Al, respectively. Films grown onto Al/0.32Mo however featured improved surface roughness. Roughness values were measured to be 1.3nm and 5.4 nm for AlN films grown on AlMo and on Al, respectively. In turn, the dielectric constant was measured to be 8.9±0.7 for AlN deposited on Al/0.32Mo seed layer, and 8.7±0.7 for AlN deposited on aluminum; thus, equivalent within experimental error. Compatibility of this room temperature process with the lift-off patterning of the deposited AlN is also reported. PMID:26193701

  13. Low Temperature Reactive Sputtering of Thin Aluminum Nitride Films on Metallic Nanocomposites.

    PubMed

    Ramadan, Khaled Sayed Elbadawi; Evoy, Stephane

    2015-01-01

    Piezoelectric aluminum nitride thin films were deposited on aluminum-molybdenum (AlMo) metallic nanocomposites using reactive DC sputtering at room temperature. The effect of sputtering parameters on film properties was assessed. A comparative study between AlN grown on AlMo and pure aluminum showed an equivalent (002) crystallographic texture. The piezoelectric coefficients were measured to be 0.5±0.1 C m(-2) and 0.9±0.1 C m(-2), for AlN deposited on Al/0.32Mo and pure Al, respectively. Films grown onto Al/0.32Mo however featured improved surface roughness. Roughness values were measured to be 1.3nm and 5.4 nm for AlN films grown on AlMo and on Al, respectively. In turn, the dielectric constant was measured to be 8.9±0.7 for AlN deposited on Al/0.32Mo seed layer, and 8.7±0.7 for AlN deposited on aluminum; thus, equivalent within experimental error. Compatibility of this room temperature process with the lift-off patterning of the deposited AlN is also reported.

  14. The influence of substrate temperature on the tribo- mechanical properties of chromium nitride thin films

    NASA Astrophysics Data System (ADS)

    Merie, V. V.; Negrea, G.; Modi, E.

    2016-08-01

    Different nitrides such as titanium nitride, chromium nitride and so on are used in a widespread range of applications such as cutting tools, medical implants, and microelectromechanical devices and all that due to their mechanical, physical and chemical properties. The aim of this study is to obtain chromium nitride thin films and to characterize them by atomic force microscopy investigations. The chromium nitride thin films were deposited by reactive magnetron sputtering on silicon substrates. During the deposition process, the discharge current, the argon and nitrogen flows, the pressure inside the chamber and the deposition time were kept constant. A chromium target with a purity of 99.95 % was used. Some of the films were deposited after a chromium buffer layer was previously deposited on the silicon substrate. The deposition was carried out when substrate temperature was at room temperature, at 300 and 500°C respectively. Once the films were deposited, atomic force microscopy investigations were performed in order to emphasize the influence of the substrate temperature on the topographical, mechanical and tribological characteristics. The results pointed out an important influence of the substrate temperature on topographical, mechanical and tribological properties of the investigated chromium nitride thin films.

  15. Logic circuits composed of flexible carbon nanotube thin-film transistor and ultra-thin polymer gate dielectric

    PubMed Central

    Lee, Dongil; Yoon, Jinsu; Lee, Juhee; Lee, Byung-Hyun; Seol, Myeong-Lok; Bae, Hagyoul; Jeon, Seung-Bae; Seong, Hyejeong; Im, Sung Gap; Choi, Sung-Jin; Choi, Yang-Kyu

    2016-01-01

    Printing electronics has become increasingly prominent in the field of electronic engineering because this method is highly efficient at producing flexible, low-cost and large-scale thin-film transistors. However, TFTs are typically constructed with rigid insulating layers consisting of oxides and nitrides that are brittle and require high processing temperatures, which can cause a number of problems when used in printed flexible TFTs. In this study, we address these issues and demonstrate a method of producing inkjet-printed TFTs that include an ultra-thin polymeric dielectric layer produced by initiated chemical vapor deposition (iCVD) at room temperature and highly purified 99.9% semiconducting carbon nanotubes. Our integrated approach enables the production of flexible logic circuits consisting of CNT-TFTs on a polyethersulfone (PES) substrate that have a high mobility (up to 9.76 cm2 V−1 sec−1), a low operating voltage (less than 4 V), a high current on/off ratio (3 × 104), and a total device yield of 90%. Thus, it should be emphasized that this study delineates a guideline for the feasibility of producing flexible CNT-TFT logic circuits with high performance based on a low-cost and simple fabrication process. PMID:27184121

  16. Logic circuits composed of flexible carbon nanotube thin-film transistor and ultra-thin polymer gate dielectric

    NASA Astrophysics Data System (ADS)

    Lee, Dongil; Yoon, Jinsu; Lee, Juhee; Lee, Byung-Hyun; Seol, Myeong-Lok; Bae, Hagyoul; Jeon, Seung-Bae; Seong, Hyejeong; Im, Sung Gap; Choi, Sung-Jin; Choi, Yang-Kyu

    2016-05-01

    Printing electronics has become increasingly prominent in the field of electronic engineering because this method is highly efficient at producing flexible, low-cost and large-scale thin-film transistors. However, TFTs are typically constructed with rigid insulating layers consisting of oxides and nitrides that are brittle and require high processing temperatures, which can cause a number of problems when used in printed flexible TFTs. In this study, we address these issues and demonstrate a method of producing inkjet-printed TFTs that include an ultra-thin polymeric dielectric layer produced by initiated chemical vapor deposition (iCVD) at room temperature and highly purified 99.9% semiconducting carbon nanotubes. Our integrated approach enables the production of flexible logic circuits consisting of CNT-TFTs on a polyethersulfone (PES) substrate that have a high mobility (up to 9.76 cm2 V‑1 sec‑1), a low operating voltage (less than 4 V), a high current on/off ratio (3 × 104), and a total device yield of 90%. Thus, it should be emphasized that this study delineates a guideline for the feasibility of producing flexible CNT-TFT logic circuits with high performance based on a low-cost and simple fabrication process.

  17. Logic circuits composed of flexible carbon nanotube thin-film transistor and ultra-thin polymer gate dielectric.

    PubMed

    Lee, Dongil; Yoon, Jinsu; Lee, Juhee; Lee, Byung-Hyun; Seol, Myeong-Lok; Bae, Hagyoul; Jeon, Seung-Bae; Seong, Hyejeong; Im, Sung Gap; Choi, Sung-Jin; Choi, Yang-Kyu

    2016-05-17

    Printing electronics has become increasingly prominent in the field of electronic engineering because this method is highly efficient at producing flexible, low-cost and large-scale thin-film transistors. However, TFTs are typically constructed with rigid insulating layers consisting of oxides and nitrides that are brittle and require high processing temperatures, which can cause a number of problems when used in printed flexible TFTs. In this study, we address these issues and demonstrate a method of producing inkjet-printed TFTs that include an ultra-thin polymeric dielectric layer produced by initiated chemical vapor deposition (iCVD) at room temperature and highly purified 99.9% semiconducting carbon nanotubes. Our integrated approach enables the production of flexible logic circuits consisting of CNT-TFTs on a polyethersulfone (PES) substrate that have a high mobility (up to 9.76 cm(2) V(-1) sec(-)1), a low operating voltage (less than 4 V), a high current on/off ratio (3 × 10(4)), and a total device yield of 90%. Thus, it should be emphasized that this study delineates a guideline for the feasibility of producing flexible CNT-TFT logic circuits with high performance based on a low-cost and simple fabrication process.

  18. Thin film phase diagram of iron nitrides grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Gölden, D.; Hildebrandt, E.; Alff, L.

    2017-01-01

    A low-temperature thin film phase diagram of the iron nitride system is established for the case of thin films grown by molecular beam epitaxy and nitrided by a nitrogen radical source. A fine-tuning of the nitridation conditions allows for growth of α ‧ -Fe8Nx with increasing c / a -ratio and magnetic anisotropy with increasing x until almost phase pure α ‧ -Fe8N1 thin films are obtained. A further increase of nitrogen content below the phase decomposition temperature of α ‧ -Fe8N (180 °C) leads to a mixture of several phases that is also affected by the choice of substrate material and symmetry. At higher temperatures (350 °C), phase pure γ ‧ -Fe4N is the most stable phase.

  19. Chemical vapor deposition and atomic layer deposition of metal oxide and nitride thin films

    NASA Astrophysics Data System (ADS)

    Barton, Jeffrey Thomas

    Processes for depositing thin films with various electronic, optical, mechanical, and chemical properties are indispensable in many industries today. Of the many deposition methods available, chemical vapor deposition (CVD) has proved over time to be one of the most flexible, efficient, and cost-effective. Atomic layer deposition (ALD) is a newer process that is gaining favor as a method for depositing films with excellent properties and unparalleled precision. This work describes the development of novel CVD and ALD processes to deposit a variety of materials. Hafnium oxide and zirconium oxide show promise as replacements for SiO 2 as gate dielectrics in future-generation transistors. These high-k materials would provide sufficient capacitance with layers thick enough to avoid leakage from tunneling. An ALD method is presented here for depositing conformal hafnium oxide from tetrakis-(diethylamido)hafnium and oxygen gas. A CVD method for depositing zirconium oxide from tetrakis-(dialkylamido)zirconium and either oxygen gas or water vapor is also described. The use of copper for interconnects in integrated circuits requires improved diffusion barrier materials, given its high diffusivity compared to the previously-used aluminum and tungsten. Tungsten nitride has a low resistivity among barrier materials, and can be deposited in amorphous films that are effective diffusion barriers in layers as thin as a few nanometers. Here we demonstrate CVD and plasma-enhanced CVD methods to deposit tungsten nitride films from bis-(dialkylamido)bis-( tert-butylimido)tungsten precursors and ammonia gas. Recent findings had shown uniform copper growth on tantalum silicate films, without the dewetting that usually occurs on oxide surfaces. Tantalum and tungsten silicates were deposited by a CVD reaction from the reaction of either tris-(diethylamido)ethylimido tantalum or bis-(ethylmethylamido)-bis-( tert-butylimido)tungsten with tris-(tert-butoxy)silanol. The ability of evaporated

  20. Crystallographic investigation of aluminium nitride thin films on stainless steel foil for highly efficient piezoelectric vibration energy harvesters

    NASA Astrophysics Data System (ADS)

    Moriwaki, N.; Minh, L. V.; Ohigashi, R.; Shimada, O.; Kitayoshi, H.; Kuwano, H.

    2016-11-01

    This study reports piezoelectric properties and crystallographic microstructures of aluminium nitride (AlN, wurtzite structure) thin films on 50 μm thick stainless steel foil. The transverse piezoelectric coefficient d31f and e31f of 10 pm thick AlN films were estimated as -1.42 ± 0.08 μm/V and -0.48 ± 0.03 C/m2 from a tip displacement of the piezoelectric cantilevers. Dielectric constant s33 was measured as 10.5 ± 1.0. An electron beam diffraction pattern by a high-resolution transmission electron microscope and x-ray diffraction pattern showed that abundance ratio of the orientation such as <101>, <102> and <103> of AlN crystal on stainless steel foils increased with increasing thickness.

  1. Dielectric Properties of Boron Nitride-Ethylene Glycol (BN-EG) Nanofluids

    NASA Astrophysics Data System (ADS)

    Fal, Jacek; Cholewa, Marian; Gizowska, Magdalena; Witek, Adam; ŻyŁa, GaweŁ

    2017-02-01

    This paper presents the results of experimental investigation of the dielectric properties of ethylene glycol (EG) with various load of boron nitride (BN) nanoparticles. The nanofuids were prepared by using a two-step method on the basis of commercially available BN nanoparticles. The measurements were carried out using the Concept 80 System (NOVOCONTROL Technologies GmbH & Co. KG, Montabaur, Germany) in a frequency range from 10 Hz to 10 MHz and temperatures from 278.15 K to 328.15 K. The frequency-dependent real (ɛ ^' }) and imaginary (ɛ ^' ' }) parts of the complex permittivity (ɛ ^*) and the alternating current (AC) conductivity are presented. Also, the effect of temperature and mass concentrations on the dielectric properties of BN-EG nanofluids are demonstrated. The results show that the most significant increase can be achieved for 20 wt.% of BN nanoparticles at 283.15 K and 288.15 K, that is eleven times larger than in the case of pure EG.

  2. Temperature effect on low-k dielectric thin films studied by ERDA

    SciTech Connect

    Jensen, Jens; Possnert, Göran; Zhang, Yanwen

    2008-09-23

    Low-k dielectric materials are becoming increasingly interesting as alternative to SiO2 with device geometries shrinking beyond the 65 nm technology node. At elevated temperatures hydrogen migration becomes an important degradation mechanism for conductivity breakdown in semiconductor devices. The possibility of hydrogen release during the fabrication process is, therefore, of great interest in the understanding of device reliability. In this study, various low-k dielectric films were subjected to thermal annealing at temperatures that are generally used for device fabrication. Elastic recoil detection analysis (ERDA) was used to investigate compositional changes and hydrogen redistribution in thin films of plasma-enhanced tetraethylortho-silicate (PETEOS), phosphorus doped silicon glass (PSG), silicon nitride (SiN) and silicon oxynitride (SiON). Except for an initial hydrogen release from the surface region in films of PETEOS and PSG, the results indicate that the elemental composition of the films was stable for at least 2 hours at 450°C.

  3. Nanocharacterization of Titanium Nitride Thin Films Obtained by Reactive Magnetron Sputtering

    NASA Astrophysics Data System (ADS)

    Merie, Violeta Valentina; Pustan, Marius Sorin; Bîrleanu, Corina; Negrea, Gavril

    2015-05-01

    Titanium nitride thin films are used in applications such as tribological layers for cutting tools, coating of some medical devices (scalpel blades, prosthesis, implants, etc.), sensors, electrodes for bioelectronics, microelectronics, diffusion barrier, bio-micro-electromechanical systems, and so on. This work is a comparative study concerning the influence of substrate temperature on some mechanical and tribological characteristics of titanium nitride thin films. The researched thin films were obtained by the reactive magnetron sputtering method. The experiments employed two kinds of substrates: a steel substrate and a silicon one. The elaboration of titanium nitride thin films was done at two temperatures. First, when the substrates were at room temperature, and second, when the substrates were previously heated at 250°C. The temperature of 250°C was kept constant during the deposition of the films. The samples were then investigated by atomic force microscopy in order to establish their mechanical and tribological properties. The nanohardness, Young's modulus, roughness, and friction force were some of the determined characteristics. The results demonstrated that the substrate which was previously heated at 250°C led to the obtaining of more adherent titanium nitride thin films than the substrate used at room temperature. The preheating of both substrates determined the decrease of thin films roughness. The friction force, nanohardness and Young's modulus of the tested samples increased when the substrates were preheated at 250°C.

  4. Boosting the Transparency of Thin Layers by Coatings of Opposing Susceptibility: How Metals Help See Through Dielectrics

    PubMed Central

    Shakhs, Mohammed Al; Augusto, Lucian; Markley, Loïc; Chau, Kenneth J.

    2016-01-01

    We propose a hypothesis that a very thin layer can be made more transparent by adding a thin coating with susceptibility of opposing sign. Two experimental tests backed by a theoretical model support this hypothesis. First, we show that the visible and near-infrared transmission through a semi-transparent silver film can be enhanced by up to ~70% and spectrally tailored depending on the type and thickness of the dielectric coating. Material types explored as dielectric coating layers include conventional metal oxides (titanium dioxide) and lesser-explored elemental semiconductors (undoped silicon, p-type silicon, and germanium). Second, and more surprisingly, we show that coating a 50-nm-thick silicon nitride membrane with a 10-nm-thick silver layer can modestly enhance the transmission by up to 6 ± 1% in the blue part of the spectrum. Transmission enhancements are observed for three silver-coated membranes in different configurations. Thinner silver coatings are theoretically capable of enhancement factors greater than 10%, but implementation is restricted by challenges in making smooth and continuous silver films below 10 nm in thickness. This study is important because it is the first demonstration of reciprocity with respect to the transmission enhancements achieved by combining thin metallic and dielectric layers. PMID:26860979

  5. Dielectric breakdown in nano-porous thin films

    NASA Astrophysics Data System (ADS)

    Borja, Juan Pablo

    Unknown to most computer users and mobile device enthusiasts, we have finally entered into a critical age of chip manufacturing. January of 2014 marks the official start of the quest by the semiconductor industry to successfully integrate sub 14nm process technology nodes in accordance to the International Technology Roadmap for Semiconductors (ITRS). The manufacturing of nano-scale features represents a major bottleneck of its own. However, a bigger challenge lies in reliably isolating the massive chip interconnect network. The present work is aimed at generating a theoretical and experimental framework to predict dielectric breakdown for thin films used in computer chip components. Here, a set of experimental techniques are presented to assess and study dielectric failure in novel thin films. A theory of dielectric breakdown in thin nano-porous films is proposed to describe combined intrinsic and metal ion catalyzed failure. This theory draws on experimental evidence as well as fundamental concepts from mass and electronic charge transport. The drift of metal species was found to accelerate intrinsic dielectric failure. The solubility of metals species such as Cu was found to range from 7.0x1025 ions/m3 to 1.86x1026 ions/m3 in 7% porous SiCOH films. The diffusion coefficient for Cu species was found to span from 4.2x10-19 m2/s to 1.86x10-21 m2/s. Ramped voltage stress experiments were used to identify intrinsic failure from metal catalyzed failure. Intrinsic breakdown is defined when time to failure against applied field ramp rate results in ∂(ln(TTF))/∂(ln(R)) ≈ -1. Intrinsic failure was studied using Au. Here, ∂(ln(TTF))/∂(ln(R)) ≈ -0.95, which is an experimental best case scenario for intrinsic failure. Au is commonly reluctant to ionize which means that failure occurs in the absence of ionic species. Metal catalyzed failure was investigated using reactive electrodes such as Cu, and Ag. Here, trends for ∂(ln(TTF))/∂(ln(R)) significantly

  6. Nanocharacterization of titanium nitride thin films obtained by reactive magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Merie, V. V.; Pustan, M. S.; Bîrleanu, C.; Negrea, G.

    2014-08-01

    Titanium nitride thin films are used in applications such as tribological layers for cutting tools, coating of some medical devices (scalpel blades, prosthesis, implants etc.), sensors, electrodes for bioelectronics, microelectronics, diffusion barrier, bio-microelectromechanical systems (Bio-MEMS) and so on. This work is a comparative study concerning the influence of substrate temperature on some mechanical and tribological characteristics of titanium nitride thin films. The researched thin films were obtained by reactive magnetron sputtering method. The experiments employed two kinds of substrates: a steel substrate and a silicon one. The elaboration of titanium nitride thin films was done at two temperatures. First, the obtaining was realized when the substrates were at room temperature, and second, the obtaining was realized when the substrates were previously heated at 250 °C. The elaborated samples were then investigated by atomic force microscopy in order to establish their mechanical and tribological properties. The nanohardness, roughness, friction force are some of the determined characteristics. The results marked out that the substrate which was previously heated at 250 °C led to the obtaining of more adherent titanium nitride thin films than the substrate used at room temperature.

  7. Improving dielectric properties of epitaxial Gd{sub 2}O{sub 3} thin films on silicon by nitrogen doping

    SciTech Connect

    Roy Chaudhuri, Ayan; Osten, H. J.; Fissel, A.; Archakam, V. R.

    2013-01-14

    We report about the effect of nitrogen doping on the electrical properties of epitaxial Gd{sub 2}O{sub 3} thin films. Epitaxial Gd{sub 2}O{sub 3}:N thin films were grown on Si (111) substrates by solid source molecular beam epitaxy using nitrous oxide as the nitridation agent. Substitutional nitrogen incorporation into the dielectric layer was confirmed by secondary ion mass spectroscopy and X-ray photoelectron spectroscopy analysis. Substantial reduction of the leakage current density and disappearance of hysteresis in capacitance-voltage characteristics observed in the Gd{sub 2}O{sub 3}:N layers indicate that nitrogen incorporation in Gd{sub 2}O{sub 3} effectively eliminates the adverse effects of the oxygen vacancy induced defects in the oxide layer.

  8. Epitaxial ternary nitride thin films prepared by a chemical solution method

    SciTech Connect

    Luo, Hongmei; Feldmann, David M; Wang, Haiyan; Bi, Zhenxing

    2008-01-01

    It is indispensable to use thin films for many technological applications. This is the first report of epitaxial growth of ternary nitride AMN2 films. Epitaxial tetragonal SrTiN2 films have been successfully prepared by a chemical solution approach, polymer-assisted deposition. The structural, electrical, and optical properties of the films are also investigated.

  9. Electrical dependence on the chemical composition of the gate dielectric in indium gallium zinc oxide thin-film transistors

    SciTech Connect

    Tari, Alireza Lee, Czang-Ho; Wong, William S.

    2015-07-13

    Bottom-gate thin-film transistors were fabricated by depositing a 50 nm InGaZnO (IGZO) channel layer at 150 °C on three separate gate dielectric films: (1) thermal SiO{sub 2}, (2) plasma-enhanced chemical-vapor deposition (PECVD) SiN{sub x}, and (3) a PECVD SiO{sub x}/SiN{sub x} dual-dielectric. X-ray photoelectron and photoluminescence spectroscopy showed the V{sub o} concentration was dependent on the hydrogen concentration of the underlying dielectric film. IGZO films on SiN{sub x} (high V{sub o}) and SiO{sub 2} (low V{sub o}) had the highest and lowest conductivity, respectively. A PECVD SiO{sub x}/SiN{sub x} dual-dielectric layer was effective in suppressing hydrogen diffusion from the nitride layer into the IGZO and resulted in higher resistivity films.

  10. Bandwidth Enhancement of Cylindrical Dielectric Resonator Antenna Using Thin Dielectric Layer Fed by Resonating Slot

    NASA Astrophysics Data System (ADS)

    Mishra, Nipun K.; Das, Soma; Vishwakarma, Dinesh K.

    2016-09-01

    In this paper Cylindrical Dielectric Resonator Antenna (CDRA) has been designed for X-band frequency range applications with slot feeding. Bandwidth of designed cylindrical dielectric resonator antenna has been enhanced by making the slot to be resonating and inserting very thin low permittivity dielectric layer between the slot and CDRA. Resonating slot excites the closely spaced HEM11δ and HEM21δ mode inside the antenna as well as provides the resonance at the upper side of desired X-band. Low profile low permittivity layer provides the excellent matching of these modes and shift the HEM21δ mode to higher frequency side at 11.25 GHz with better impedance matching. By combining all of three resonances, nearly 85 % increment in impedance Bandwidth has been obtained with reference to non resonating slot excited CDRA. Fractional impedance bandwidth for proposed design is 48 % and average Gain of 6 dB with more than 92 % radiation efficiency has been shown by the antenna throughout the desired band with broadside pattern.

  11. Effect of gate-dielectrics on the electrical characteristics of solution-processed single-wall-carbon-nanotube thin-film transistors

    NASA Astrophysics Data System (ADS)

    Ha, Tae-Jun

    2017-02-01

    High performance of solution-processed, single-wall-carbon-nanotube (SWCNT) thin-film transistors (TFTs) is investigated through the use in the different gate-dielectrics of silicon dioxide (SiO2), silicon nitride (SiNx), the bilayers of SiO2 and SiNx, and hexagonal boron-nitride (h-BN) thin films. The different interfacial characteristics affect the electrical characteristics of the SWCNT-TFTs including key device metrics. Significantly, the hysteresis window that is normally observed in drop-casted SWCNT-TFTs was majorly suppressed by the employment of a thin lower dielectric-constant material on a higher dielectricconstant material. Sub-2V operating SWCNT-TFTs with solution-processed h-BN gate dielectrics with good above- and sub-threshold characteristics are also investigated on the basis of interfacial characteristics underlying the device physics. Such performance can be realized by the suppressed interfacial impurity scattering through the chemically clean interface combined with optimized solution-process below 100 °C. [Figure not available: see fulltext.

  12. Comparison of device structures for the dielectric breakdown measurement of hexagonal boron nitride

    NASA Astrophysics Data System (ADS)

    Hattori, Yoshiaki; Taniguchi, Takashi; Watanabe, Kenji; Nagashio, Kosuke

    2016-12-01

    Improving the film quality in the synthesis of large-area hexagonal boron nitride films (h-BN) for two-dimensional material devices remains a great challenge. The measurement of electrical breakdown dielectric strength (EBD) is one of the most important methods to elucidate the insulating quality of h-BN. In this work, the EBD of high quality exfoliated single-crystal h-BN was investigated using three different electrode structures under different environmental conditions to determine the ideal electrode structure and environment for EBD measurement. A systematic investigation revealed that EBD is not sensitive to contact force or electrode area but strongly depends on the relative humidity during measurement. Once the measurement environment is properly managed, it was found that the EBD values are consistent within experimental error regardless of the electrode structure, which enables the evaluation of the crystallinity of synthesized h-BN at the microscopic and macroscopic level by utilizing the three different electrode structures properly for different purposes.

  13. Heat resistive dielectric multi-layer micro-mirror array in epitaxial lateral overgrowth gallium nitride.

    PubMed

    Huang, Chen-Yang; Ku, Hao-Min; Liao, Wei-Tsai; Chao, Chu-Li; Tsay, Jenq-Dar; Chao, Shiuh

    2009-03-30

    Ta2O5 / SiO2 dielectric multi-layer micro-mirror array (MMA) with 3mm mirror size and 6mm array period was fabricated on c-plane sapphire substrate. The MMA was subjected to 1200 degrees C high temperature annealing and remained intact with high reflectance in contrast to the continuous multi-layer for which the layers have undergone severe damage by 1200 degrees C annealing. Epitaxial lateral overgrowth (ELO) of gallium nitride (GaN) was applied to the MMA that was deposited on both sapphire and sapphire with 2:56 mm GaN template. The MMA was fully embedded in the ELO GaN and remained intact. The result implies that our MMA is compatible to the high temperature growth environment of GaN and the MMA could be incorporated into the structure of the micro-LED array as a one to one micro backlight reflector, or as the patterned structure on the large area LED for controlling the output light.

  14. Tunable electrical and optical properties of hafnium nitride thin films

    NASA Astrophysics Data System (ADS)

    Farrell, I. L.; Reeves, R. J.; Preston, A. R. H.; Ludbrook, B. M.; Downes, J. E.; Ruck, B. J.; Durbin, S. M.

    2010-02-01

    We report structural and electronic properties of epitaxial hafnium nitride films grown on MgO by plasma-assisted pulsed laser deposition. The electronic structure measured using soft x-ray absorption and emission spectroscopy is in excellent agreement with the results of a band structure calculation. We show that by varying the growth conditions we can extend the films' reflectance further toward the UV, and we relate this observation to the electronic structure.

  15. Aligned Growth of Millimeter-Size Hexagonal Boron Nitride Single-Crystal Domains on Epitaxial Nickel Thin Film.

    PubMed

    Meng, Junhua; Zhang, Xingwang; Wang, Ye; Yin, Zhigang; Liu, Heng; Xia, Jing; Wang, Haolin; You, Jingbi; Jin, Peng; Wang, Denggui; Meng, Xiang-Min

    2017-03-07

    Atomically thin hexagonal boron nitride (h-BN) is gaining significant attention for many applications such as a dielectric layer or substrate for graphene-based devices. For these applications, synthesis of high-quality and large-area h-BN layers with few defects is strongly desirable. In this work, the aligned growth of millimeter-size single-crystal h-BN domains on epitaxial Ni (111)/sapphire substrates by ion beam sputtering deposition is demonstrated. Under the optimized growth conditions, single-crystal h-BN domains up to 0.6 mm in edge length are obtained, the largest reported to date. The formation of large-size h-BN domains results mainly from the reduced Ni-grain boundaries and the improved crystallinity of Ni film. Furthermore, the h-BN domains show well-aligned orientation and excellent dielectric properties. In addition, the sapphire substrates can be repeatedly used with almost no limit. This work provides an effective approach for synthesizing large-scale high-quality h-BN layers for electronic applications.

  16. Dielectric relaxation of thin films of polyamide random copolymers

    NASA Astrophysics Data System (ADS)

    Taniguchi, Natsumi; Fukao, Koji; Sotta, Paul; Long, Didier R.

    2015-05-01

    We investigate the relaxation behavior of thin films of a polyamide random copolymer, PA66/6I, with various film thicknesses using dielectric relaxation spectroscopy. Two dielectric signals are observed at high temperatures, the α process and the relaxation process due to electrode polarization (the EP process). The relaxation time of the EP process has a Vogel-Fulcher-Tammann type of temperature dependence, and the glass transition temperature, Tg, evaluated from the EP process agrees very well with the Tg determined from the thermal measurements. The fragility index derived from the EP process increases with decreasing film thickness. The relaxation time and the dielectric relaxation strength of the EP process are described by a linear function of the film thickness d for large values of d , which can be regarded as experimental evidence for the validity of attributing the observed signal to the EP process. Furthermore, there is distinct deviation from this linear law for thicknesses smaller than a critical value. This deviation observed in thinner films is associated with an increase in the mobility and/or diffusion constant of the charge carriers responsible for the EP process. The α process is located in a higher-frequency region than the EP process at high temperatures but merges with the EP process at lower temperatures near the glass transition region. The thickness dependence of the relaxation time of the α process is different from that of the EP process. This suggests that there is decoupling between the segmental motion of the polymers and the translational motion of the charge carriers in confinement.

  17. Nanoscale electrochemistry using dielectric thin films as solid electrolytes

    NASA Astrophysics Data System (ADS)

    Valov, Ilia; Lu, Wei D.

    2016-07-01

    It is now well known that at the nanoscale matters behave differently compared to bulk phases. Increased reactivity, deviations in structural, thermodynamic and kinetic properties make nanoscale materials and processes attractive for both fundamental research and applications. Here we show that nanometer thin films of materials with dielectric properties at the macroscopic level such as SiO2, Ta2O5 and HfO2 behave as solid electrolytes and exhibit evident ionic transport and electrochemical redox reactions. Experimental studies demonstrate that classical electrochemical potentiodynamic and steady state methods can be used to study the mass and charge transport at the nanoscale. We believe these reported properties of nanomatter open new opportunities for fundamental research and applications.

  18. Structural and Magnetic Properties of Thin Film of Iron Nitride

    NASA Astrophysics Data System (ADS)

    Kayani, Zohra Nazir; Riaz, Saira; Naseem, Shahzad

    2014-12-01

    The nano-crystalline iron nitride films with a mixture of γ-Fe4N, ɛFe3N and αFe2N phases were synthesized on copper substrate by sol-gel technology. The structure, morphology and magnetic properties of the samples were characterized using X-ray diffraction, scanning electron microscopy, and vibrating sample magnetometer. The films are ferromagnetic at room temperature. Magnetic properties such as coercive forces and saturation magnetization were found to be 398 Oestered and 32.92 emu/cm3, respectively.

  19. Thin films of pure vanadium nitride: Evidence for anomalous non-faradaic capacitance

    NASA Astrophysics Data System (ADS)

    Bondarchuk, Oleksandr; Morel, Alban; Bélanger, Daniel; Goikolea, Eider; Brousse, Thierry; Mysyk, Roman

    2016-08-01

    An impressive gravimetric capacitance of 1300 F g-1 (surface capacitance ∼3.3 mF cm-2) reported by Choi et al., 2006 for nanosized vanadium nitride has stimulated considerable interest in vanadium nitride as a potential electrode material for energy storing systems - supercapacitors. The postulated mechanism of charge storage in vanadium nitride materials involves redox reactions in the thin surface layer of vanadium oxide while the core vanadium nitride serves exclusively as a conducting platform. In this study we have synthesized pure oxygen-free vanadium nitride films and have found that they are capable of delivering a surface capacitance of up to ∼3 mF cm-2 at a potential scan rate of 3 mV s-1 and ∼2 mF cm-2 at a potential scan rate of 1 V s-1 in aqueous electrolytes. Combining electrochemical testing with X-ray photoelectron spectroscopy characterization has revealed that redox reactions play no or little role in the electrochemical response of pure VN, in contrast to the common wisdom stemming from the electrochemical response of oxygen-containing films. An alternative charge storage mechanism - space charge accumulation in a subsurface layer of ∼100 nm - was put forward to explain the experimentally observed capacitance of VN films in aqueous electrolytes.

  20. Marine corrosion protective coatings of hexagonal boron nitride thin films on stainless steel.

    PubMed

    Husain, Esam; Narayanan, Tharangattu N; Taha-Tijerina, Jose Jaime; Vinod, Soumya; Vajtai, Robert; Ajayan, Pulickel M

    2013-05-22

    Recently, two-dimensional, layered materials such as graphene and hexagonal boron nitride (h-BN) have been identified as interesting materials for a range of applications. Here, we demonstrate the corrosion prevention applications of h-BN in marine coatings. The performance of h-BN/polymer hybrid coatings, applied on stainless steel, were evaluated using electrochemical techniques in simulated seawater media [marine media]. h-BN/polymer coating shows an efficient corrosion protection with a low corrosion current density of 5.14 × 10(-8) A/cm(2) and corrosion rate of 1.19 × 10(-3) mm/year and it is attributed to the hydrofobic, inert and dielectric nature of boron nitride. The results indicated that the stainless steel with coatings exhibited improved corrosion resistance. Electrochemical impedance spectroscopy and potentiodynamic analysis were used to propose a mechanism for the increased corrosion resistance of h-BN coatings.

  1. Thermal conductivity of ultra-thin chemical vapor deposited hexagonal boron nitride films

    SciTech Connect

    Alam, M. T.; Haque, M. A.; Bresnehan, M. S.; Robinson, J. A.

    2014-01-06

    Thermal conductivity of freestanding 10 nm and 20 nm thick chemical vapor deposited hexagonal boron nitride films was measured using both steady state and transient techniques. The measured value for both thicknesses, about 100 ± 10 W m{sup −1} K{sup −1}, is lower than the bulk basal plane value (390 W m{sup −1} K{sup −1}) due to the imperfections in the specimen microstructure. Impressively, this value is still 100 times higher than conventional dielectrics. Considering scalability and ease of integration, hexagonal boron nitride grown over large area is an excellent candidate for thermal management in two dimensional materials-based nanoelectronics.

  2. Largely enhanced dielectric properties of carbon nanotubes/polyvinylidene fluoride binary nanocomposites by loading a few boron nitride nanosheets

    NASA Astrophysics Data System (ADS)

    Yang, Minhao; Zhao, Hang; He, Delong; Bai, Jinbo

    2016-08-01

    The ternary nanocomposites of boron nitride nanosheets (BNNSs)/carbon nanotubes (CNTs)/polyvinylidene fluoride (PVDF) are fabricated via a combination of solution casting and extrusion-injection processes. The effects of BNNSs on the electrical conductivity, dielectric behavior, and microstructure changes of CNTs/PVDF binary nanocomposites are systematically investigated. A low percolation value (fc) for the CNTs/PVDF binary system is obtained due to the integration of solution and melting blending procedures. Two kinds of CNTs/PVDF binary systems with various CNTs contents (fCNTs) as the matrix are discussed. The results reveal that compared with CNTs/PVDF binary systems at the same fCNTs, the ternary BNNSs/CNTs/PVDF nanocomposites exhibit largely enhanced dielectric properties due to the improvement of the CNTs dispersion state and the conductive network. The dielectric constant of CNTs/PVDF binary nanocomposite with 6 vol. % CNTs (fCNTs < fc) shows a 79.59% enhancement from 49 to 88 after the incorporation of 3 vol. % BNNSs. For the other CNTs/PVDF system with 8 vol. % CNTs (fCNTs > fc), it displays a 43.32% improvement from 1325 to 1899 after the addition of 3 vol. % BNNSs. The presence of BNNSs facilitates the formation of the denser conductive network. Meanwhile, the ternary BNNSs/CNTs/PVDF systems exhibit a low dielectric loss. The adjustable dielectric properties could be obtained by employing the ternary systems due to the microstructure changes of nanocomposites.

  3. Boron Nitride Nanotube Mat as a Low- k Dielectric Material with Relative Dielectric Constant Ranging from 1.0 to 1.1

    NASA Astrophysics Data System (ADS)

    Hong, Xinghua; Wang, Daojun; Chung, D. D. L.

    2016-01-01

    This paper reports that a boron nitride nanotube (BNNT) mat containing air and 1.4 vol.% BNNTs is a low- k dielectric material for microelectronic packaging, exhibiting relative dielectric constant of 1.0 to 1.1 (50 Hz to 2 MHz) and elastic modulus of 10 MPa. The mat is prepared by compacting BNNTs at 5.8 kPa. This paper also presents measurements of the dielectric properties of BNNTs (mostly multiwalled). The relative dielectric constant of the BNNT solid in the mat decreases with increasing frequency, with attractively low values ranging from 3.0 to 6.2; the alternating-current (AC) electrical conductivity increases with increasing frequency, with attractively low values ranging from 10-10 S/m to 10-6 S/m and an approximately linear relationship between log conductivity and log frequency. The specific contact capacitance of the interface between BNNTs and the electrical contact decreases with increasing frequency, with attractively high values ranging from 1.6 μF/m2 to 2.3 μF/m2. The AC electrical resistivity of the BNNT-contact interface decreases with increasing frequency, with high values ranging from 0.14 MΩ cm2 to 440 MΩ cm2.

  4. Application of thin dielectric films in low coherence fiber-optic Fabry-Pérot sensing interferometers: comparative study

    NASA Astrophysics Data System (ADS)

    Hirsch, Marzena; Wierzba, Paweł; Jedrzejewska-Szczerska, Małgorzata

    2016-11-01

    We examine the application of selected thin dielectric films, deposited by atomic layer deposition (ALD), in a low coherence fiber-optic Fabry-Pérot interferometer designed for sensing applications. Such films can be deposited on the end-face of a single mode optical fiber (SMF-28) in order to modify the reflectivity of the Fabry-Pérot cavity, to provide protection of the fibers from aggressive environments or to create a multi-cavity interferometric sensor. Spectral reflectance of films made from zinc oxide (ZnO), titanium dioxide (TiO2), aluminum oxide (Al2O3) and boron nitride (BN) was calculated for various thickness of the films and compared. The results show that the most promising materials for use in fiber-optic Fabry-Pérot interferometer are TiO2 and ZnO, although Al2O3 is also suitable for this application.

  5. Selective sputtering and atomic resolution imaging of atomically thin boron nitride membranes.

    PubMed

    Meyer, Jannik C; Chuvilin, Andrey; Algara-Siller, Gerardo; Biskupek, Johannes; Kaiser, Ute

    2009-07-01

    We report on the preparation, atomic resolution imaging, and element selective damage mechanism in atomically thin boron nitride membranes. Flakes of less than 10 layers are prepared by mechanical cleavage and are thinned down to single layers in a high-energy electron beam. At our beam energies, we observe a highly selective sputtering of only one of the elements and predominantly at the exit surface of the specimen, and then subsequent removal of atoms next to a defect. Triangle-shaped holes appear in accordance with the crystallographic orientation of each layer. Defects are compared to those observed in graphene membranes. The observation of clean single-layer membranes shows that hexagonal boron nitride is a further material (in addition to graphene) that can exist in a quasi-two-dimensional allotrope without the need for a substrate.

  6. Elemental composition and microstructure of reactively sputtered carbon nitride thin films

    NASA Astrophysics Data System (ADS)

    Kumar, Sunil; Tansley, T. L.

    1994-10-01

    Thin films of carbon nitride have been grown on various substrates using low power radio frequency reactive sputtering of graphite in pure nitrogen plasma. A quantitative composition analysis using Rutherford backscattering spectrometry shows that the film contains about 51 at. % C, 44 at. % N, and 5 at.% O. The study of the microstructure of the films using cross-sectional scanning electron microscopy reveals highly oriented columnar structures.

  7. Parallel writing on zirconium nitride thin films by local oxidation nanolithography

    NASA Astrophysics Data System (ADS)

    Farkas, N.; Comer, J. R.; Zhang, G.; Evans, E. A.; Ramsier, R. D.; Wight, S.; Dagata, J. A.

    2004-12-01

    Parallel pattern transfer of submicrometer-scale oxide features onto zirconium nitride thin films is reported. The oxidation reaction was verified by Auger microprobe analysis and secondary ion mass spectrometry. Oxide features of ˜70nm in height can be formed and selectively etched in a dilute aqueous hydrogen fluoride solution. This provides an interesting route to potential new applications for high-melting point, biocompatible surfaces that possess small feature sizes with controlled geometries.

  8. Pulsed DC magnetron sputtered piezoelectric thin film aluminum nitride – Technology and piezoelectric properties

    SciTech Connect

    Stoeckel, C. Kaufmann, C.; Hahn, R.; Schulze, R.; Billep, D.; Gessner, T.

    2014-07-21

    Pulsed DC magnetron sputtered aluminum nitride (AlN) thin films are prepared on several seed layers and at different sputtering conditions. The piezoelectric c-axis (002) orientation of the AlN is analyzed with X-ray diffraction method. The transverse piezoelectric coefficient d{sub 31} is determined with a Laser-Doppler-Vibrometer at cantilevers and membranes by analytical calculations and finite element method. Additionally, thin film AlN on bulk silicon is used to characterize the longitudinal piezoelectric charge coefficient d{sub 33}.

  9. Surface scattering mechanisms of tantalum nitride thin film resistor

    NASA Astrophysics Data System (ADS)

    Chen, Huey-Ru; Chen, Ying-Chung; Chang, Ting-Chang; Chang, Kuan-Chang; Tsai, Tsung-Ming; Chu, Tian-Jian; Shih, Chih-Cheng; Chuang, Nai-Chuan; Wang, Kao-Yuan

    2014-04-01

    In this letter, we utilize an electrical analysis method to develop a TaN thin film resistor with a stricter spec and near-zero temperature coefficient of resistance (TCR) for car-used electronic applications. Simultaneously, we also propose a physical mechanism mode to explain the origin of near-zero TCR for the TaN thin film resistor (TFR). Through current fitting, the carrier conduction mechanism of the TaN TFR changes from hopping to surface scattering and finally to ohmic conduction for different TaN TFRs with different TaN microstructures. Experimental data of current-voltage measurement under successive increasing temperature confirm the conduction mechanism transition. A model of TaN grain boundary isolation ability is eventually proposed to influence the carrier transport in the TaN thin film resistor, which causes different current conduction mechanisms.

  10. Thin boron nitride nanotubes with exceptionally high strength and toughness

    NASA Astrophysics Data System (ADS)

    Huang, Yang; Lin, Jing; Zou, Jin; Wang, Ming-Sheng; Faerstein, Konstantin; Tang, Chengchun; Bando, Yoshio; Golberg, Dmitri

    2013-05-01

    Bending manipulation and direct force measurements of ultrathin boron nitride nanotubes (BNNTs) were performed inside a transmission electron microscope. Our results demonstrate an obvious transition in mechanics of BNNTs when the external diameters of nanotubes are in the range of 10 nm or less. During in situ transmission electron microscopy bending tests, characteristic ``hollow'' ripple-like structures formed in the bent ultrathin BNNTs with diameters of sub-10 nm. This peculiar buckling/bending mode makes the ultrathin BNNTs hold very high post-buckling loads which significantly exceed their initial buckling forces. Exceptional compressive/bending strength as high as ~1210 MPa was observed. Moreover, the analysis of reversible bending force curves of such ultrathin nanotubes indicates that they may store/adsorb strain energy at a density of ~400 × 106 J m-3. Such nanotubes are thus very promising for strengthening and toughening of structural ceramics and may find potential applications as effective energy-absorbing materials like armor.Bending manipulation and direct force measurements of ultrathin boron nitride nanotubes (BNNTs) were performed inside a transmission electron microscope. Our results demonstrate an obvious transition in mechanics of BNNTs when the external diameters of nanotubes are in the range of 10 nm or less. During in situ transmission electron microscopy bending tests, characteristic ``hollow'' ripple-like structures formed in the bent ultrathin BNNTs with diameters of sub-10 nm. This peculiar buckling/bending mode makes the ultrathin BNNTs hold very high post-buckling loads which significantly exceed their initial buckling forces. Exceptional compressive/bending strength as high as ~1210 MPa was observed. Moreover, the analysis of reversible bending force curves of such ultrathin nanotubes indicates that they may store/adsorb strain energy at a density of ~400 × 106 J m-3. Such nanotubes are thus very promising for strengthening and

  11. Giant Dielectric Permittivity in Ferroelectric Thin Films: Domain Wall Ping Pong

    PubMed Central

    Quan Jiang, An; Jian Meng, Xiang; Wei Zhang, David; Hyuk Park, Min; Yoo, Sijung; Jin Kim, Yu; Scott, James F.; Seong Hwang, Cheol

    2015-01-01

    The dielectric permittivity in ferroelectric thin films is generally orders of magnitude smaller than in their bulk. Here, we discover a way of increasing dielectric constants in ferroelectric thin films by ca. 500% by synchronizing the pulsed switching fields with the intrinsic switching time (nucleation of domain plus forward growth from cathode to anode). In a 170-nm lead zirconate titanate thin film with an average grain size of 850 nm this produces a dielectric constant of 8200 with the maximum nucleus density of 3.8 μm−2, which is one to three orders of magnitude higher than in other dielectric thin films. This permits smaller capacitors in memory devices and is a step forward in making ferroelectric domain-engineered nano-electronics. PMID:26440528

  12. Pulsed laser deposition of niobium nitride thin films

    SciTech Connect

    Farha, Ashraf Hassan Elsayed-Ali, Hani E.; Ufuktepe, Yüksel; Myneni, Ganapati

    2015-12-04

    Niobium nitride (NbN{sub x}) films were grown on Nb and Si(100) substrates using pulsed laser deposition. NbN{sub x} films were deposited on Nb substrates using PLD with a Q-switched Nd:YAG laser (λ = 1064 nm, ∼40 ns pulse width, and 10 Hz repetition rate) at different laser fluences, nitrogen background pressures and deposition substrate temperatures. When all the fabrication parameters are fixed, except for the laser fluence, the surface roughness, nitrogen content, and grain size increase with increasing laser fluence. Increasing nitrogen background pressure leads to a change in the phase structure of the NbN{sub x} films from mixed β-Nb{sub 2}N and cubic δ-NbN phases to single hexagonal β-Nb{sub 2}N. The substrate temperature affects the preferred orientation of the crystal structure. The structural and electronic, properties of NbN{sub x} deposited on Si(100) were also investigated. The NbN{sub x} films exhibited a cubic δ-NbN with a strong (111) orientation. A correlation between surface morphology, electronic, and superconducting properties was found. The observations establish guidelines for adjusting the deposition parameters to achieve the desired NbN{sub x} film morphology and phase.

  13. Strong oxidation resistance of atomically thin boron nitride nanosheets.

    PubMed

    Li, Lu Hua; Cervenka, Jiri; Watanabe, Kenji; Taniguchi, Takashi; Chen, Ying

    2014-02-25

    Investigation of oxidation resistance of two-dimensional (2D) materials is critical for many of their applications because 2D materials could have higher oxidation kinetics than their bulk counterparts due to predominant surface atoms and structural distortions. In this study, the oxidation behavior of high-quality boron nitride (BN) nanosheets of 1-4 layers thick has been examined by heating in air. Atomic force microscopy and Raman spectroscopy analyses reveal that monolayer BN nanosheets can sustain up to 850 °C, and the starting temperature of oxygen doping/oxidation of BN nanosheets only slightly increases with the increase of nanosheet layer and depends on heating conditions. Elongated etch lines are found on the oxidized monolayer BN nanosheets, suggesting that the BN nanosheets are first cut along the chemisorbed oxygen chains and then the oxidative etching grows perpendicularly to these cut lines. The stronger oxidation resistance of BN nanosheets makes them more preferable for high-temperature applications than graphene.

  14. Pulsed laser deposition of niobium nitride thin films

    NASA Astrophysics Data System (ADS)

    Farha, Ashraf Hassan; Ufuktepe, Yüksel; Myneni, Ganapati; Elsayed-Ali, Hani E.

    2015-12-01

    Niobium nitride (NbNx) films were grown on Nb and Si(100) substrates using pulsed laser deposition. NbNx films were deposited on Nb substrates using PLD with a Q-switched Nd:YAG laser (λ = 1064 nm, ˜40 ns pulse width, and 10 Hz repetition rate) at different laser fluences, nitrogen background pressures and deposition substrate temperatures. When all the fabrication parameters are fixed, except for the laser fluence, the surface roughness, nitrogen content, and grain size increase with increasing laser fluence. Increasing nitrogen background pressure leads to a change in the phase structure of the NbNx films from mixed β-Nb2N and cubic δ-NbN phases to single hexagonal β-Nb2N. The substrate temperature affects the preferred orientation of the crystal structure. The structural and electronic, properties of NbNx deposited on Si(100) were also investigated. The NbNx films exhibited a cubic δ-NbN with a strong (111) orientation. A correlation between surface morphology, electronic, and superconducting properties was found. The observations establish guidelines for adjusting the deposition parameters to achieve the desired NbNx film morphology and phase.

  15. Post-deposition annealing study of tantalum nitride thin-film resistors

    SciTech Connect

    Au, Chi Lok.

    1989-01-01

    With the present integrated circuit design, the use of hybrid metallic thin film resistor networks leads to more design flexibility, economical chip area consumption, reduced processing steps, higher precision and stability for the integrated circuits. To meet the hybrid circuit requirements, the thin film resistors must have high sheet resistivity for compact design, chemical and mechanical stability, and precise resistance which is temperature independent. The nickel-chrome (NiCr) alloy, with its very low temperature coefficient of resistance (TCR), is currently used in the industry. The non-linear TCR behavior and the ease of hydrolytic dissociation of NiCr give place to a more stable material, such as tantalum nitride. Due to technical difficulties in heating the substrate to a high temperature during deposition, which is the controlling parameter for achieving the stable Ta{sub 2}N structure, post deposition annealing becomes the central theme for this project. Preliminary TCR studies of the reactive sputtered tantalum nitride thin films shows that films with sheet resistivity less than 60 ohm/sq. can be air annealed to improve the TCR to less than 30 ppm/{degree}C in magnitude. The deposition parameters may influence the annealing conditions. For films with higher sheet resistivity, high vacuum annealing must be used for the TCR improvement. The TCR can be adjusted to an almost zero value by the combination of annealing temperature and time. With the electrical stability and chemically inertness in water and acids, tantalum nitride is likely to become a major thin-film resistor material in the industry. A systematic study of this thin film material is conducted, covering both electrical and structural properties.

  16. Ultraviolet-assisted oxidation and nitridation of hafnium and hafnium aluminum alloys as potential gate dielectrics for metal oxide semiconductor applications

    NASA Astrophysics Data System (ADS)

    Essary, Chad Robert

    The continued miniaturization of silicon-based complimentary metal oxide semiconductor (CMOS) devices is pushing the limits of the silicon dioxide (SiO2) gate dielectric. As the channel widths are decreased to increase packing densities and functionality of new chips, proportional vertical scaling of the dielectric must be maintained to keep constant capacitances. Silicon dioxide is approaching its fundamental limit in which it can be used as the gate dielectric due to high leakage currents resulting from direct tunneling through the layer. In order for the continued use of current CMOS gate design, an alternative material with a higher dielectric constant must be found. Several materials have been proposed but are still not providing the electrical characteristics favorable for use in the devices due to problems with excessive leakage and hysteresis resulting from the quality of the film and oxygen defects. The goal of this study is to create higher quality films at lower processing temperatures with low leakage and less hysteresis than has been achieved with hafnium oxide films. This study first examines the formation of the interfacial layer in pulsed laser deposited hafnium oxide films to understand the kinetics behind its formation. The second section focuses on the oxidation of pulsed laser deposited (PLD) hafnium metal thin films using ultraviolet (UV) assisted post-deposition annealing. Another set of samples was deposited in an ammonia atmosphere in order to incorporate nitrogen into the films. Comparisons of microstructure and stoichiometry of oxidized hafnium and oxy-nitride films were made using x-ray photospectroscopy, variable angle spectroscopic ellipsometry, glancing angle x-ray spectroscopy, x-ray reflectivity, and atomic force microscopy. Analysis of the interface between the films and the silicon substrate was carried out using x-ray reflectivity. The electrical characteristics of the films were characterized using capacitance-voltage and current

  17. Bismuth pyrochlore thin films for dielectric energy storage

    SciTech Connect

    Michael, Elizabeth K. Trolier-McKinstry, Susan

    2015-08-07

    Thin films of cubic pyrochlore bismuth zinc niobate, bismuth zinc tantalate, and bismuth zinc niobate tantalate were fabricated using chemical solution deposition. This family of materials exhibited moderate relative permittivities between 55 ± 2 and 145 ± 5 for bismuth zinc tantalate and bismuth zinc niobate, respectively, and low loss tangents on the order of 0.0008 ± 0.0001. Increases in the concentration of the tantalum end member increased the dielectric breakdown strength. For example, at 10 kHz, the room temperature breakdown strength of bismuth zinc niobate was 5.1 MV/cm, while that of bismuth zinc tantalate was 6.1 MV/cm. This combination of a high breakdown strength and a moderate permittivity led to a high discharged energy storage density for all film compositions. For example, at a measurement frequency of 10 kHz, bismuth zinc niobate exhibited a maximum recoverable energy storage density of 60.8 ± 2.0 J/cm{sup 3}, while bismuth zinc tantalate exhibited a recoverable energy storage density of 60.7 ± 2.0 J/cm{sup 3}. Intermediate compositions of bismuth zinc niobate tantalate offered higher energy storage densities; at 10 mol. % tantalum, the maximum recoverable energy storage density was ∼66.9 ± 2.4 J/cm{sup 3}.

  18. Thin-ribbon tapered coupler for dielectric waveguides

    NASA Technical Reports Server (NTRS)

    Yeh, C.; Otoshi, T. Y.; Shimabukuro, F. I.

    1994-01-01

    A recent discovery shows that a high-dielectric constant, low-loss, solid material can be made into a ribbon-like waveguide structure to yield an attenuation constant of less than 0.02 dB/m for single-mode guidance of millimeter/submillimeter waves. One of the crucial components that must be invented in order to guarantee the low-loss utilization of this dielectric-waveguide guiding system is the excitation coupler. The traditional tapered-to-a-point coupler for a dielectric rod waveguide fails when the dielectric constant of the dielectric waveguide is large. This article presents a new way to design a low-loss coupler for a high- or low-dielectric constant dielectric waveguide for millimeter or submillimeter waves.

  19. Foreign Object Damage of Two Gas-Turbine Grade Silicon Nitrides in a Thin Disk Configuration

    NASA Technical Reports Server (NTRS)

    Choi, Sung R.; Pereira, J. Michael; Janosik, Lesley A.; Bhatt, Ramakrishna T.

    2003-01-01

    Foreign object damage (FOD) behavior of two commercial gas-turbine grade silicon nitrides, AS800 and SN282, was determined at ambient temperature through post-impact strength testing for thin disks impacted by steel-ball projectiles with a diameter of 1.59 mm in a velocity range from 115 to 440 m/s. AS800 silicon nitride exhibited a greater FOD resistance than SN282, primarily due to its greater value of fracture toughness (K(sub IC)). The critical impact velocity in which the corresponding post-impact strength yielded the lowest value was V(sub c) approx. 440 and 300 m/s for AS800 and SN282, respectively. A unique lower-strength regime was typified for both silicon nitrides depending on impact velocity, attributed to significant radial cracking. The damages generated by projectile impact were typically in the forms of ring, radial, and cone cracks with their severity and combination being dependent on impact velocity. Unlike thick (3 mm) flexure bar specimens used in the previous studies, thin (2 mm) disk target specimens exhibited a unique backside radial cracking occurring on the reverse side just beneath the impact sites at and above impact velocity of 160 and 220 m/s for SN282 and AS800, respectively.

  20. Mechanisms of Low-Temperature Nitridation Technology on a TaN Thin Film Resistor for Temperature Sensor Applications

    NASA Astrophysics Data System (ADS)

    Chen, Huey-Ru; Chen, Ying-Chung; Chang, Ting-Chang; Chang, Kuan-Chang; Tsai, Tsung-Ming; Chu, Tian-Jian; Shih, Chih-Cheng; Chuang, Nai-Chuan; Wang, Kao-Yuan

    2016-06-01

    In this letter, we propose a novel low-temperature nitridation technology on a tantalum nitride (TaN) thin film resistor (TFR) through supercritical carbon dioxide (SCCO2) treatment for temperature sensor applications. We also found that the sensitivity of temperature of the TaN TFR was improved about 10.2 %, which can be demonstrated from measurement of temperature coefficient of resistance (TCR). In order to understand the mechanism of SCCO2 nitridation on the TaN TFR, the carrier conduction mechanism of the device was analyzed through current fitting. The current conduction mechanism of the TaN TFR changes from hopping to a Schottky emission after the low-temperature SCCO2 nitridation treatment. A model of vacancy passivation in TaN grains with nitrogen and by SCCO2 nitridation treatment is eventually proposed to increase the isolation ability in TaN TFR, which causes the transfer of current conduction mechanisms.

  1. Mechanisms of Low-Temperature Nitridation Technology on a TaN Thin Film Resistor for Temperature Sensor Applications.

    PubMed

    Chen, Huey-Ru; Chen, Ying-Chung; Chang, Ting-Chang; Chang, Kuan-Chang; Tsai, Tsung-Ming; Chu, Tian-Jian; Shih, Chih-Cheng; Chuang, Nai-Chuan; Wang, Kao-Yuan

    2016-12-01

    In this letter, we propose a novel low-temperature nitridation technology on a tantalum nitride (TaN) thin film resistor (TFR) through supercritical carbon dioxide (SCCO2) treatment for temperature sensor applications. We also found that the sensitivity of temperature of the TaN TFR was improved about 10.2 %, which can be demonstrated from measurement of temperature coefficient of resistance (TCR). In order to understand the mechanism of SCCO2 nitridation on the TaN TFR, the carrier conduction mechanism of the device was analyzed through current fitting. The current conduction mechanism of the TaN TFR changes from hopping to a Schottky emission after the low-temperature SCCO2 nitridation treatment. A model of vacancy passivation in TaN grains with nitrogen and by SCCO2 nitridation treatment is eventually proposed to increase the isolation ability in TaN TFR, which causes the transfer of current conduction mechanisms.

  2. Adhesion analysis for chromium nitride thin films deposited by reactive magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Rusu, F. M.; Merie, V. V.; Pintea, I. M.; Molea, A.

    2016-08-01

    The thin film industry is continuously growing due to the wide range of applications that require the fabrication of advanced components such as sensors, biological implants, micro-electromechanical devices, optical coatings and so on. The selection regarding the deposition materials, as well as the deposition technology influences the properties of the material and determines the suitability of devices for certain real-world applications. This paper is focused on the adhesion force for several chromium nitride thin films obtained by reactive magnetron sputtering. All chromium nitride thin films were deposited on a silicon substrate, the discharge current and the argon flow being kept constant. The main purpose of the paper is to determine the influence of deposition parameters on the adhesion force. Therefore some of the deposition parameters were varied in order to study their effect on the adhesion force. Experimentally, the values of the adhesion force were determined in multiple points for each sample using the spectroscopy in point mode of the atomic force microscope. The obtained values were used to estimate the surface energy of the CrN thin films based on two existing mathematical models for the adhesion force when considering the contact between two bodies.

  3. Nitride passivation of the interface between high-k dielectrics and SiGe

    SciTech Connect

    Sardashti, Kasra; Hu, Kai-Ting; Tang, Kechao; McIntyre, Paul; Madisetti, Shailesh; Oktyabrsky, Serge; Siddiqui, Shariq; Sahu, Bhagawan; Yoshida, Naomi; Kachian, Jessica; Dong, Lin; Fruhberger, Bernd; Kummel, Andrew C.

    2016-01-04

    In-situ direct ammonia (NH{sub 3}) plasma nitridation has been used to passivate the Al{sub 2}O{sub 3}/SiGe interfaces with Si nitride and oxynitride. X-ray photoelectron spectroscopy of the buried Al{sub 2}O{sub 3}/SiGe interface shows that NH{sub 3} plasma pre-treatment should be performed at high temperatures (300 °C) to fully prevent Ge nitride and oxynitride formation at the interface and Ge out-diffusion into the oxide. C-V and I-V spectroscopy results show a lower density of interface traps and smaller gate leakage for samples with plasma nitridation at 300 °C.

  4. Electrical stress in CdS thin film transistors using HfO2 gate dielectric

    NASA Astrophysics Data System (ADS)

    García, R.; Mejia, I.; Molinar-Solis, J. E.; Salas-Villasenor, A. L.; Morales, A.; García, B.; Quevedo-Lopez, M. A.; Alemán, M.

    2013-05-01

    During thin film transistor (TFT) operation, gate dielectric is under a bias stress condition. In this work, bias stress effect for CdS TFT using HfO2 as gate dielectric is analyzed. Threshold voltage, Ion/Ioff ratio, and subthreshold slope were studied in order to understand changes produced at the dielectric semiconductor interface. We observed that threshold voltage shift is related with negative charge trapping in the dielectric/semiconductor interface and for this phenomenon we propose a trapping charge model. Finally, the TFT output characteristic was modeled considering a shift in the threshold voltage for each gate voltage curve.

  5. Submillimeter and Far-Infrared Dielectric Properties of Thin Films

    NASA Technical Reports Server (NTRS)

    Cataldo, Giuseppe; Wollack, Edward J.

    2016-01-01

    The complex dielectric function enables the study of a material's refractive and absorptive properties and provides information on a material's potential for practical application. Commonly employed line shape profile functions from the literature are briefly surveyed and their suitability for representation of dielectric material properties are discussed. An analysis approach to derive a material's complex dielectric function from observed transmittance spectra in the far-infrared and submillimeter regimes is presented. The underlying model employed satisfies the requirements set by the Kramers-Kronig relations. The dielectric function parameters derived from this approach typically reproduce the observed transmittance spectra with an accuracy of less than 4%.

  6. Phase formation, thermal stability and magnetic moment of cobalt nitride thin films

    SciTech Connect

    Gupta, Rachana; Pandey, Nidhi; Tayal, Akhil; Gupta, Mukul E-mail: dr.mukul.gupta@gmail.com

    2015-09-15

    Cobalt nitride (Co-N) thin films prepared using a reactive magnetron sputtering process are studied in this work. During the thin film deposition process, the relative nitrogen gas flow (R{sub N{sub 2}}) was varied. As R{sub N{sub 2}} increases, Co(N), Co{sub 4}N, Co{sub 3}N and CoN phases are formed. An incremental increase in R{sub N{sub 2}}, after emergence of Co{sub 4}N phase at R{sub N{sub 2}} = 10%, results in a linear increase of the lattice constant (a) of Co{sub 4}N. For R{sub N{sub 2}} = 30%, a maximizes and becomes comparable to its theoretical value. An expansion in a of Co{sub 4}N, results in an enhancement of the magnetic moment, to the extent that it becomes even larger than pure Co. Such larger than pure metal magnetic moment for tetra-metal nitrides (M{sub 4}N) have been theoretically predicted. Incorporation of N atoms in M{sub 4}N configuration results in an expansion of a (relative to pure metal) and enhances the itinerary of conduction band electrons leading to larger than pure metal magnetic moment for M{sub 4}N compounds. Though a higher (than pure Fe) magnetic moment for Fe{sub 4}N thin films has been evidenced experimentally, higher (than pure Co) magnetic moment is evidenced in this work.

  7. Seed-layer mediated orientation evolution in dielectric Bi-Zn-Ti-Nb-O thin films

    NASA Astrophysics Data System (ADS)

    Kim, Jin Young; Noh, Jun Hong; Lee, Sangwook; Yoon, Sung-Hun; Cho, Chin Moo; Hong, Kug Sun; Jung, Hyun Suk; Lee, Jung-Kun

    2007-12-01

    Highly (hhh)-oriented pyrochlore Bi-Zn-Ti-Nb-O (BZTN) thin films were fabricated via metal-organic decomposition using orientation template layers. The preferred orientation was ascribed to the interfacial layer, the lattice parameter of which is similar to BZTN. High-resolution transmission electron microscopy supported that the interfacial layer consists of Bi and Pt. The (hhh)-oriented thin films exhibited a highly insulating nature enabling feasible applications in electronic devices, particularly voltage tunable application. The BZTN thin films did not show any apparent dielectric anisotropy and the slightly enhanced dielectric properties were discussed in connection to the internal stress and the grain boundary effect.

  8. Sigma-pi molecular dielectric multilayers for low-voltage organic thin-film transistors.

    PubMed

    Yoon, Myung-Han; Facchetti, Antonio; Marks, Tobin J

    2005-03-29

    Very thin (2.3-5.5 nm) self-assembled organic dielectric multilayers have been integrated into organic thin-film transistor structures to achieve sub-1-V operating characteristics. These new dielectrics are fabricated by means of layer-by-layer solution phase deposition of molecular silicon precursors, resulting in smooth, nanostructurally well defined, strongly adherent, thermally stable, virtually pinhole-free, organosiloxane thin films having exceptionally large electrical capacitances (up to approximately 2,500 nF.cm(-2)), excellent insulating properties (leakage current densities as low as 10(-9) A.cm(-2)), and single-layer dielectric constant (k)of approximately 16. These 3D self-assembled multilayers enable organic thin-film transistor function at very low source-drain, gate, and threshold voltages (<1 V) and are compatible with a broad variety of vapor- or solution-deposited p- and n-channel organic semiconductors.

  9. Fullerenelike arrangements in carbon nitride thin films grown by direct ion beam sputtering

    SciTech Connect

    Gago, R.; Abrasonis, G.; Muecklich, A.; Moeller, W.; Czigany, Zs.; Radnoczi, G.

    2005-08-15

    Carbon nitride (CN{sub x}) thin films were grown by direct N{sub 2}/Ar ion beam sputtering of a graphite target at moderate substrate temperatures (300-750 K). The resulting microstructure of the films was studied by high-resolution transmission electron microscopy. The images showed the presence of curved basal planes in fullerenelike arrangements. The achievement and evolution of these microstructural features are discussed in terms of nitrogen incorporation, film-forming flux, and ion bombardment effects, thus adding to the understanding of the formation mechanisms of curved graphitic structures in CN{sub x} materials.

  10. Pulsed photothermal reflectance measurement of the thermal conductivity of sputtered aluminum nitride thin films

    SciTech Connect

    Zhao Yimin; Zhu Chunlin; Wang Sigen; Tian, J.Z.; Yang, D.J.; Chen, C.K.; Cheng Hao; Hing, Peter

    2004-10-15

    We report on measurements of the thermal conductivity of reactively sputtered aluminum nitride (AlN) thin films with different thickness, ranging from 100 nm to 1 {mu}m, on silicon substrates. The measurements were made at room temperature using the pulsed photothermal reflectance technique. The thermal conductivities of the sample are found to be significantly lower than the single-crystal bulk AlN and increase with an increasing thickness. The thermal resistance at the interface between the AlN film and the silicon substrate is found to be about 7-8x10{sup -8} m{sup 2} K/W.

  11. Lorentz factor determination for local electric fields in semiconductor devices utilizing hyper-thin dielectrics

    SciTech Connect

    McPherson, J. W.

    2015-11-28

    The local electric field (the field that distorts, polarizes, and weakens polar molecular bonds in dielectrics) has been investigated for hyper-thin dielectrics. Hyper-thin dielectrics are currently required for advanced semiconductor devices. In the work presented, it is shown that the common practice of using a Lorentz factor of L = 1/3, to describe the local electric field in a dielectric layer, remains valid for hyper-thin dielectrics. However, at the very edge of device structures, a rise in the macroscopic/Maxwell electric field E{sub diel} occurs and this causes a sharp rise in the effective Lorentz factor L{sub eff}. At capacitor and transistor edges, L{sub eff} is found to increase to a value 2/3 < L{sub eff} < 1. The increase in L{sub eff} results in a local electric field, at device edge, that is 50%–100% greater than in the bulk of the dielectric. This increase in local electric field serves to weaken polar bonds thus making them more susceptible to breakage by standard Boltzmann and/or current-driven processes. This has important time-dependent dielectric breakdown (TDDB) implications for all electronic devices utilizing polar materials, including GaN devices that suffer from device-edge TDDB.

  12. High-K Lanthanum Zirconium Oxide Thin Film Dielectrics from Aqueous Solution Precursors.

    PubMed

    Woods, Keenan Navarre; Chiang, Tsung-Han; Plassmeyer, Paul N; Kast, Matthew G; Lygo, Alexander C; Grealish, Aidan K; Boettcher, Shannon W; Page, Catherine J

    2017-03-06

    Metal oxide thin films are critical in modern electronic applications. In particular, high-κ dielectrics are of interest for reducing power consumption in metal-insulator-semiconductor (MIS) field-effect transistors. Although thin-film materials are typically produced via vacuum-based methods, solution deposition offers a scalable and cost-efficient alternative. We report an all-inorganic aqueous solution route to amorphous lanthanum zirconium oxide (La2Zr2O7, "LZO") dielectric thin films. LZO films were spin-cast from aqueous solutions of metal nitrates and annealed at temperatures between 300 and 600 °C to produce dense, defect-free, and smooth films with sub-nm roughness. Dielectric constants of 12.2 to 16.4 and loss tangents < 0.6% were obtained for MIS devices utilizing LZO as the dielectric layer (1 kHz). Leakage currents < 10-7 A cm-2 at 4 MV cm-1 were measured for samples annealed at 600 °C. The excellent surface morphology, high dielectric constants, and low leakage current densities makes these LZO dielectrics promising candidates for thin-film transistor devices.

  13. Synthesis of atomically thin hexagonal boron nitride films on nickel foils by molecular beam epitaxy

    SciTech Connect

    Nakhaie, S.; Wofford, J. M.; Schumann, T.; Jahn, U.; Ramsteiner, M.; Hanke, M.; Lopes, J. M. J. Riechert, H.

    2015-05-25

    Hexagonal boron nitride (h-BN) is a layered two-dimensional material with properties that make it promising as a dielectric in various applications. We report the growth of h-BN films on Ni foils from elemental B and N using molecular beam epitaxy. The presence of crystalline h-BN over the entire substrate is confirmed by Raman spectroscopy. Atomic force microscopy is used to examine the morphology and continuity of the synthesized films. A scanning electron microscopy study of films obtained using shorter depositions offers insight into the nucleation and growth behavior of h-BN on the Ni substrate. The morphology of h-BN was found to evolve from dendritic, star-shaped islands to larger, smooth triangular ones with increasing growth temperature.

  14. Dielectric and Ferroelectric Properties of Lead Lanthanum Zirconate Titanate Thin Films for Capacitive Energy Storage

    NASA Astrophysics Data System (ADS)

    Tong, Sheng

    As the increasing requirement of alternative energy with less pollution influence and higher energy efficient, new energy source and related storage methods are hot topic nowadays. Capacitors that supply high instant power are one of the keys in this application for both economic and functional design aspects. To lower the cost and increases the volumetric efficiency and reliability, relaxor thin films are considered as one of the candidates of the next generation capacitors. The research mainly focuses on dielectric and ferroelectric properties of lead lanthanum zirconate titanate or Pb1-xLax(ZryTi1-y)O3 (PLZT, x/y/1-y) relaxor thin films deposited on silicon (Si) and nickel (Ni) substrates in a range of thickness with different bottom electrodes, e.g. Platinum (Pt) and LaNiO3 (LNO). The final fabricated PLZT film capacitors will show strong potential for the energy storage application. The method adopted is the acetic acid assisted sol-gel deposition for the PLZT thin films. The wet chemical process is cost-effective and easily to scale up for plant/industrial products. We investigated the different bottom electrode/substrate influence in structure, microstructure, phases/defects, and heat-treatment conditions to achieve the optimized PLZT thin films. Issues of basic physical size effects in the PLZT thin films were also investigated, including thickness effects in the dielectric and ferroelectric properties of the films in a wide range of temperatures, the phase transition of the thin-film relaxors, lanthanum content effect, electrode-dielectric junction, misfit strain effect, etc. Based on the results and analysis, optimum PLZT film capacitors can be determined of proper substrate/electrode/dielectric that achieves the desired dielectric properties required for different applications, especially a more cost-effective method to develop volumetrically efficient capacitors with high charge density, energy density, dielectric breakdown strength, energy storage

  15. Scattering from thin dielectric straps surrounding a perfectly conducting structure

    NASA Technical Reports Server (NTRS)

    Al-Hekail, Zeyad O.; Gupta, Inder J.; Burnside, Walter D.

    1993-01-01

    Dielectric straps can support very heavy targets and have low backscattering levels, especially at low frequencies (below 8 GHz); thus, they can be used effectively to support targets during backscattered field measurements. In this paper, the scattered fields of nonmagnetic dielectric straps surrounding a perfectly conducting structure are presented, and the computed results are compared with experimental data. Empirical formulas for the strap scattered fields are also given. These formulas are good for general convex structures whose radii of curvature are large compared with the wavelength and are expected to give a reasonable estimate of the true backscattered fields from the dielectric straps when used as a target support structure.

  16. The Behavior of Thin Dielectrics Under Electron Irradiation

    DTIC Science & Technology

    1980-03-01

    occurred if a dielectric sheet was pre- sent in the chamber under vacuum . (The original experiments will be discussed in detail shortly.) This...breakdown through the dielectric, surface flashover , and ion production. However, the responsi- ble mechanism was not identified. The behavior of...one of the principal surface materials used in satellites. As such, their behavior is of concern in SGEMP (system- generated electromagnetic pulse

  17. Reactive DC magnetron sputtered zirconium nitride (ZrN) thin film and its characterization

    NASA Astrophysics Data System (ADS)

    Subramanian, B.; Ashok, K.; Sanjeeviraja, C.; Kuppusami, P.; Jayachandran, M.

    2008-05-01

    Zirconium nitride (ZrN) thin films were prepared by using reactive direct current (DC) magnetron sputtering onto different substrates. A good polycrystalline nature with face centered cubic structure was observed from X-ray Diffraction for ZrN thin films. The observed 'd' values from the X-ray Diffraction pattern were found to be in good agreement with the standard 'd' values (JCPDS-89-5269). An emission peak is observed at 587nm from Photoluminescence studies for the excitation at 430nm. The resistivity value (ρ) of 2.1798 (μΩ cm) was observed. ZrN has high wear resistance and low coefficient of friction. A less negative value of Ecorr and lower value of Icorr observed for ZrN / Mild Steel (MS) clearly confirm the better corrosion resistance than the bare substrate. Also the higher Rct value and lower Cdl value was observed for ZrN / MS from Nyquist - plot.

  18. Effects of deposition temperature on the mechanical and physical properties of silicon nitride thin films

    NASA Astrophysics Data System (ADS)

    Walmsley, B. A.; Liu, Y.; Hu, X. Z.; Bush, M. B.; Winchester, K. J.; Martyniuk, M.; Dell, J. M.; Faraone, L.

    2005-08-01

    This study investigates the mechanical and physical properties of low-temperature plasma-enhanced chemical-vapor-deposited silicon nitride thin films, with particular respect to the effect of deposition temperature. The mechanical properties of the films were evaluated by both nanoindentation and microcantilever beam-bending techniques. The cantilever beam specimens were fabricated from silicon nitride thin films deposited on (100) silicon wafer by bulk micromachining. The density of the films was determined from quartz crystal microbalance measurements, as well as from the resonant modes of the cantilever beams, which were mechanically excited using an atomic force microscope. It was found that both the Young's modulus and density of the films were significantly reduced with decreasing deposition temperature. The decrease in Young's modulus is attributed to the decreasing material density. The decrease in density with decreasing deposition temperature is believed to be due to the slower diffusion rates of the deposited species, which retarded the densification of the film during the deposition process.

  19. Hexagonal boron nitride thin film thermal neutron detectors with high energy resolution of the reaction products

    NASA Astrophysics Data System (ADS)

    Doan, T. C.; Majety, S.; Grenadier, S.; Li, J.; Lin, J. Y.; Jiang, H. X.

    2015-05-01

    Hexagonal boron nitride (h-BN) is highly promising for solid-state thermal neutron detector applications due to its many outstanding physical properties, especially its very large thermal neutron capture cross-section (~3840 barns for 10B), which is several orders of magnitude larger than those of most other isotopes. The focus of the present work is to carry out studies on h-BN thin film and detector properties to lay the foundation for the development of a direct-conversion solid-state thermal neutron detector with high sensitivity. The measured carrier mobility-lifetime (μτ) product of h-BN thin films grown on sapphire substrates is 2.83×10-7 cm2/V for electrons and holes, which is comparable to the value of about 10-7 cm2/V for GaN thin films grown on sapphire. Detectors based on h-BN thin films were fabricated and the nuclear reaction product pulse height spectra were measured. Under a bias of 20 V, very narrow individual peaks corresponding to the reaction product energies of α and Li particles as well as the sum peaks have been clearly resolved in the pulse height spectrum for the first time by a B-based direct-conversion semiconductor neutron detector. Our results indicate that h-BN thin film detectors possess unique advantages including small size, low weight, portability, low voltage operation and high energy resolution of specific reaction products.

  20. Impact of annealing temperature on the mechanical and electrical properties of sputtered aluminum nitride thin films

    SciTech Connect

    Gillinger, M.; Schneider, M.; Bittner, A.; Schmid, U.; Nicolay, P.

    2015-02-14

    Aluminium nitride (AlN) is a promising material for challenging sensor applications such as process monitoring in harsh environments (e.g., turbine exhaust), due to its piezoelectric properties, its high temperature stability and good thermal match to silicon. Basically, the operational temperature of piezoelectric materials is limited by the increase of the leakage current as well as by enhanced diffusion effects in the material at elevated temperatures. This work focuses on the characterization of aluminum nitride thin films after post deposition annealings up to temperatures of 1000 °C in harsh environments. For this purpose, thin film samples were temperature loaded for 2 h in pure nitrogen and oxygen gas atmospheres and characterized with respect to the film stress and the leakage current behaviour. The X-ray diffraction results show that AlN thin films are chemically stable in oxygen atmospheres for 2 h at annealing temperatures of up to 900 °C. At 1000 °C, a 100 nm thick AlN layer oxidizes completely. For nitrogen, the layer is stable up to 1000 °C. The activation energy of the samples was determined from leakage current measurements at different sample temperatures, in the range between 25 and 300 °C. Up to an annealing temperature of 700 °C, the leakage current in the thin film is dominated by Poole-Frenkel behavior, while at higher annealing temperatures, a mixture of different leakage current mechanisms is observed.

  1. Exciton-dominated dielectric function of atomically thin MoS2 films

    SciTech Connect

    Yu, Yiling; Yu, Yifei; Cai, Yongqing; Li, Wei; Gurarslan, Alper; Peelaers, Hartwin; Aspnes, David E.; Van de Walle, Chris G.; Nguyen, Nhan V.; Zhang, Yong -Wei; Cao, Linyou

    2015-11-24

    We systematically measure the dielectric function of atomically thin MoS2 films with different layer numbers and demonstrate that excitonic effects play a dominant role in the dielectric function when the films are less than 5–7 layers thick. The dielectric function shows an anomalous dependence on the layer number. It decreases with the layer number increasing when the films are less than 5–7 layers thick but turns to increase with the layer number for thicker films. We show that this is because the excitonic effect is very strong in the thin MoS2 films and its contribution to the dielectric function may dominate over the contribution of the band structure. We also extract the value of layer-dependent exciton binding energy and Bohr radius in the films by fitting the experimental results with an intuitive model. The dominance of excitonic effects is in stark contrast with what reported at conventional materials whose dielectric functions are usually dictated by band structures. Lastly, the knowledge of the dielectric function may enable capabilities to engineer the light-matter interactions of atomically thin MoS2 films for the development of novel photonic devices, such as metamaterials, waveguides, light absorbers, and light emitters.

  2. Exciton-dominated dielectric function of atomically thin MoS2 films

    DOE PAGES

    Yu, Yiling; Yu, Yifei; Cai, Yongqing; ...

    2015-11-24

    We systematically measure the dielectric function of atomically thin MoS2 films with different layer numbers and demonstrate that excitonic effects play a dominant role in the dielectric function when the films are less than 5–7 layers thick. The dielectric function shows an anomalous dependence on the layer number. It decreases with the layer number increasing when the films are less than 5–7 layers thick but turns to increase with the layer number for thicker films. We show that this is because the excitonic effect is very strong in the thin MoS2 films and its contribution to the dielectric function maymore » dominate over the contribution of the band structure. We also extract the value of layer-dependent exciton binding energy and Bohr radius in the films by fitting the experimental results with an intuitive model. The dominance of excitonic effects is in stark contrast with what reported at conventional materials whose dielectric functions are usually dictated by band structures. Lastly, the knowledge of the dielectric function may enable capabilities to engineer the light-matter interactions of atomically thin MoS2 films for the development of novel photonic devices, such as metamaterials, waveguides, light absorbers, and light emitters.« less

  3. Total absorption in ultra-thin lossy layer on transparent substrate using dielectric resonance structure

    NASA Astrophysics Data System (ADS)

    Matsui, T.; Iizuka, H.

    2017-03-01

    A resonant sub-wavelength structure made of a high-refractive-index dielectric material exhibits a resonator-like response and provides unity reflection. We show that near-unity absorption is obtained by using a sub-wavelength resonant structure, which consists of periodic high-refractive-index nano-blocks, when an ultra-thin absorption layer is attached to a transparent dielectric substrate. The resonant structure does not necessarily touch the absorption layer and, therefore, a coating film can be inserted between the absorption layer and the periodic structure. Our results significantly extend application scenarios of detectors and optoelectronic devices that can be implemented on transparent dielectric substrates.

  4. Electrical conduction and dielectric relaxation properties of AlN thin films grown by hollow-cathode plasma-assisted atomic layer deposition

    NASA Astrophysics Data System (ADS)

    Altuntas, Halit; Bayrak, Turkan; Kizir, Seda; Haider, Ali; Biyikli, Necmi

    2016-07-01

    In this study, aluminum nitride (AlN) thin films were deposited at 200 °C, on p-type silicon substrates utilizing a capacitively coupled hollow-cathode plasma source integrated atomic layer deposition (ALD) reactor. The structural properties of AlN were characterized by grazing incidence x-ray diffraction, by which we confirmed the hexagonal wurtzite single-phase crystalline structure. The films exhibited an optical band edge around ˜5.7 eV. The refractive index and extinction coefficient of the AlN films were measured via a spectroscopic ellipsometer. In addition, to investigate the electrical conduction mechanisms and dielectric properties, Al/AlN/p-Si metal-insulator-semiconductor capacitor structures were fabricated, and current density-voltage and frequency dependent (7 kHz-5 MHz) dielectric constant measurements (within the strong accumulation region) were performed. A peak of dielectric loss was observed at a frequency of 3 MHz and the Cole-Davidson empirical formula was used to determine the relaxation time. It was concluded that the native point defects such as nitrogen vacancies and DX centers formed with the involvement of Si atoms into the AlN layers might have influenced the electrical conduction and dielectric relaxation properties of the plasma-assisted ALD grown AlN films.

  5. Generalized Abelnus relations for an anisotropic thin film of an arbitrary dielectric tensor.

    PubMed

    Cojocaru, E

    1997-05-01

    The extended Jones matrix method is applied to one dielectrically anisotropic, homogeneous thin film at oblique incidence. Standard boundary conditions are imposed on resultant electric- and magnetic-field vectors at interfaces. Thus simple matricial relations are obtained for transmitted and reflected electric-field amplitudes at the two interfaces. In the limits of isotropy, they reduce to four well-known Abelès relations, and thus they may be considered as generalized Abelès relations for dielectrically anisotropic thin films. These matricial relations include multiple reflections while dealing with total fields. Thus they provide new insights into the 2 x 2 extended Jones matrix formalism.

  6. AlN and Al oxy-nitride gate dielectrics for reliable gate stacks on Ge and InGaAs channels

    NASA Astrophysics Data System (ADS)

    Guo, Y.; Li, H.; Robertson, J.

    2016-05-01

    AlN and Al oxy-nitride dielectric layers are proposed instead of Al2O3 as a component of the gate dielectric stacks on higher mobility channels in metal oxide field effect transistors to improve their positive bias stress instability reliability. It is calculated that the gap states of nitrogen vacancies in AlN lie further away in energy from the semiconductor band gap than those of oxygen vacancies in Al2O3, and thus AlN might be less susceptible to charge trapping and have a better reliability performance. The unfavourable defect energy level distribution in amorphous Al2O3 is attributed to its larger coordination disorder compared to the more symmetrically bonded AlN. Al oxy-nitride is also predicted to have less tendency for charge trapping.

  7. Solution-Processed Rare-Earth Oxide Thin Films for Alternative Gate Dielectric Application.

    PubMed

    Zhuang, Jiaqing; Sun, Qi-Jun; Zhou, Ye; Han, Su-Ting; Zhou, Li; Yan, Yan; Peng, Haiyan; Venkatesh, Shishir; Wu, Wei; Li, Robert K Y; Roy, V A L

    2016-11-16

    Previous investigations on rare-earth oxides (REOs) reveal their high possibility as dielectric films in electronic devices, while complicated physical methods impede their developments and applications. Herein, we report a facile route to fabricate 16 REOs thin insulating films through a general solution process and their applications in low-voltage thin-film transistors as dielectrics. The formation and properties of REOs thin films are analyzed by atomic force microscopy (AFM), X-ray diffraction (XRD), spectroscopic ellipsometry, water contact angle measurement, X-ray photoemission spectroscopy (XPS), and electrical characterizations, respectively. Ultrasmooth, amorphous, and hydrophilic REO films with thickness around 10 nm have been obtained through a combined spin-coating and postannealing method. The compositional analysis results reveal the formation of RE hydrocarbonates on the surface and silicates at the interface of REOs films annealed on Si substrate. The dielectric properties of REO films are investigated by characterizing capacitors with a Si/Ln2O3/Au (Ln = La, Gd, and Er) structure. The observed low leakage current densities and large areal capacitances indicate these REO films can be employed as alternative gate dielectrics in transistors. Thus, we have successfully fabricated a series of low-voltage organic thin-film transistors based on such sol-gel derived REO films to demonstrate their application in electronics. The optimization of REOs dielectrics in transistors through further surface modification has also been studied. The current study provides a simple solution process approach to fabricate varieties of REOs insulating films, and the results reveal their promising applications as alternative gate dielectrics in thin-film transistors.

  8. Transition-metal-nitride-based thin films as novel energy harvesting materials

    PubMed Central

    Kerdsongpanya, Sit; Alling, Björn

    2016-01-01

    The last few years have seen a rise in the interest in early transition-metal and rare-earth nitrides, primarily based on ScN and CrN, for energy harvesting by thermoelectricity and piezoelectricity. This is because of a number of important advances, among those the discoveries of exceptionally high piezoelectric coupling coefficient in (Sc,Al)N alloys and of high thermoelectric power factors of ScN-based and CrN-based thin films. These materials also constitute well-defined model systems for investigating thermodynamics of mixing for alloying and nanostructural design for optimization of phase stability and band structure. These features have implications for and can be used for tailoring of thermoelectric and piezoelectric properties. In this highlight article, we review the ScN- and CrN-based transition-metal nitrides for thermoelectrics, and drawing parallels with piezoelectricity. We further discuss these materials as a models systems for general strategies for tailoring of thermoelectric properties by integrated theoretical–experimental approaches. PMID:27358737

  9. Transition-metal-nitride-based thin films as novel energy harvesting materials.

    PubMed

    Eklund, Per; Kerdsongpanya, Sit; Alling, Björn

    2016-05-14

    The last few years have seen a rise in the interest in early transition-metal and rare-earth nitrides, primarily based on ScN and CrN, for energy harvesting by thermoelectricity and piezoelectricity. This is because of a number of important advances, among those the discoveries of exceptionally high piezoelectric coupling coefficient in (Sc,Al)N alloys and of high thermoelectric power factors of ScN-based and CrN-based thin films. These materials also constitute well-defined model systems for investigating thermodynamics of mixing for alloying and nanostructural design for optimization of phase stability and band structure. These features have implications for and can be used for tailoring of thermoelectric and piezoelectric properties. In this highlight article, we review the ScN- and CrN-based transition-metal nitrides for thermoelectrics, and drawing parallels with piezoelectricity. We further discuss these materials as a models systems for general strategies for tailoring of thermoelectric properties by integrated theoretical-experimental approaches.

  10. Thermal stability of tungsten sub-nitride thin film prepared by reactive magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Zhang, X. X.; Wu, Y. Z.; Mu, B.; Qiao, L.; Li, W. X.; Li, J. J.; Wang, P.

    2017-03-01

    Tungsten sub-nitride thin films deposited on silicon samples by reactive magnetron sputtering were used as a model system to study the phase stability and microstructural evolution during thermal treatments. XRD, SEM&FIB, XPS, RBS and TDS were applied to investigate the stability of tungsten nitride films after heating up to 1473 K in vacuum. At the given experimental parameters a 920 nm thick crystalline film with a tungsten and nitrogen stoichiometry of 2:1 were achieved. The results showed that no phase and microstructure change occurred due to W2N film annealing in vacuum up to 973 K. Heating up to 1073 K led to a partial decomposition of the W2N phase and the formation of a W enrichment layer at the surface. Increasing the annealing time at the same temperature, the further decomposition of the W2N phase was negligible. The complete decomposition of W2N film happened as the temperature reached up to 1473 K.

  11. Unintentional carbide formation evidenced during high-vacuum magnetron sputtering of transition metal nitride thin films

    NASA Astrophysics Data System (ADS)

    Greczynski, G.; Mráz, S.; Hultman, L.; Schneider, J. M.

    2016-11-01

    Carbide signatures are ubiquitous in the surface analyses of industrially sputter-deposited transition metal nitride thin films grown with carbon-less source materials in typical high-vacuum systems. We use high-energy-resolution photoelectron spectroscopy to reveal details of carbon temporal chemical state evolution, from carbide formed during film growth to adventitious carbon adsorbed upon contact with air. Using in-situ grown Al capping layers that protect the as-deposited transition metal nitride surfaces from oxidation, it is shown that the carbide forms during film growth rather than as a result of post deposition atmosphere exposure. The XPS signature of carbides is masked by the presence of adventitious carbon contamination, appearing as soon as samples are exposed to atmosphere, and eventually disappears after one week-long storage in lab atmosphere. The concentration of carbon assigned to carbide species varies from 0.28 at% for ZrN sample, to 0.25 and 0.11 at% for TiN and HfN, respectively. These findings are relevant for numerous applications, as unintentionally formed impurity phases may dramatically alter catalytic activity, charge transport and mechanical properties by offsetting the onset of thermally-induced phase transitions. Therefore, the chemical state of C impurities in PVD-grown films should be carefully investigated.

  12. Substrate-dependent thermal conductivity of aluminum nitride thin-films processed at low temperature

    SciTech Connect

    Belkerk, B. E.; Bensalem, S.; Soussou, A.; Carette, M.; Djouadi, M. A.; Scudeller, Y.; Al Brithen, H.

    2014-12-01

    In this paper, we report on investigation concerning the substrate-dependent thermal conductivity (k) of Aluminum Nitride (AlN) thin-films processed at low temperature by reactive magnetron sputtering. The thermal conductivity of AlN films grown at low temperature (<200 °C) on single-crystal silicon (Si) and amorphous silicon nitride (SiN) with thicknesses ranging from 100 nm to 4000 nm was measured with the transient hot-strip technique. The k values for AlN films on SiN were found significantly lower than those on Silicon consistently with their microstructures revealed by X-ray diffraction, high resolution scanning electron microscopy, and transmission electron microscopy. The change in k was due to the thermal boundary resistance found to be equal to 10 × 10{sup −9} Km{sup 2}W{sup −1} on SiN against 3.5 × 10{sup −9} Km{sup 2}W{sup −1} on Si. However, the intrinsic thermal conductivity was determined with a value as high as 200 Wm{sup −1}K{sup −1} whatever the substrate.

  13. Electron transfer reactions for image and image-derived states in dielectric thin films.

    PubMed

    Jensen, E T; Sanche, L

    2008-08-21

    We have studied the cross section for electron trapping that occurs at the surfaces and interfaces of a variety of thin dielectric films (n-octane, methanol, n-butanol, and difluoromethane) that are grown on Kr buffer films. When such films are bombarded with electrons of very low incident energies (E less, similar 300 meV), charging cross sections up to the order of 10(-14) cm(2) are measured for submonolayer quantities of a variety of coadsorbed molecules: CH(3)I, CH(3)Br, CH(3)Cl, and CO(2). These huge cross sections are ascribed to the formation of image states at the dielectric film interfaces, which trap incoming electrons and, via coupling to the adsorbate electron affinity levels, dramatically enhance the capture probability. We have also shown that thin film dielectric layer structures can be created which display image-derived states, such as a "quantum well" in a sandwich structure with two "electron barrier" layers surrounding a Kr and adsorbate spacer film. These phenomena are shown to be of a general nature, occurring for a wide variety of molecular thin films, and depend on the dielectric constant and electron affinity of the selected species. We also report the absolute cross section for dissociative electron attachment of submonolayer CH(3)I adsorbed on Kr thin films.

  14. Impact of sputter deposition parameters on molybdenum nitride thin film properties

    NASA Astrophysics Data System (ADS)

    Stöber, L.; Konrath, J. P.; Krivec, S.; Patocka, F.; Schwarz, S.; Bittner, A.; Schneider, M.; Schmid, U.

    2015-07-01

    Molybdenum and molybdenum nitride thin films are presented, which are deposited by reactive dc magnetron sputtering. The influence of deposition parameters, especially the amount of nitrogen during film synthesization, to mechanical and electrical properties is investigated. The crystallographic phase and lattice constants are determined by x-ray diffraction analyses. Further information on the microstructure as well as on the biaxial film stress are gained from techniques such as transmission electron microscopy, scanning electron microscopy and the wafer bow. Furthermore, the film resistivity and the temperature coefficient of resistance are measured by the van der Pauw technique starting from room temperature up to 300 °C. Independent of the investigated physical quantity, a dominant dependence on the sputtering gas nitrogen content is observed compared to other deposition parameters such as the plasma power or the sputtering gas pressure in the deposition chamber.

  15. Review of Cernox™ (Zirconium Oxy-Nitride) Thin-Film Resistance Temperature Sensors

    NASA Astrophysics Data System (ADS)

    Courts, S. Scott; Swinehart, Philip R.

    2003-09-01

    Cernox™ resistance thermometers were commercially introduced in 1993. The Cernox™ temperature-sensing element is fabricated from zirconium reactively sputtered in a nitrogen-oxygen atmosphere. The resulting thin film is comprised of conducting zirconium nitride embedded within a zirconium oxide nonconducting matrix. This material has a negative temperature coefficient of resistance making it useful as a temperature sensor. The ratio of conducting to nonconducting material can be varied to tailor the sensor to a given temperature range. A single device can be fabricated for use from below 0.3 K to 420 K. Cernox™ temperature sensors possess many attributes desirable in a temperature sensor including high sensitivity, excellent short-term and long-term stability, small physical size, fast thermal response and small calibration shifts when exposed to magnetic fields or ionizing radiation. This paper presents a review of Cernox™ temperature sensors with regard to their physical, thermometric and operational properties and environmental effects.

  16. Tunable phonon polaritons in atomically thin van der Waals crystals of boron nitride.

    PubMed

    Dai, S; Fei, Z; Ma, Q; Rodin, A S; Wagner, M; McLeod, A S; Liu, M K; Gannett, W; Regan, W; Watanabe, K; Taniguchi, T; Thiemens, M; Dominguez, G; Castro Neto, A H; Zettl, A; Keilmann, F; Jarillo-Herrero, P; Fogler, M M; Basov, D N

    2014-03-07

    van der Waals heterostructures assembled from atomically thin crystalline layers of diverse two-dimensional solids are emerging as a new paradigm in the physics of materials. We used infrared nanoimaging to study the properties of surface phonon polaritons in a representative van der Waals crystal, hexagonal boron nitride. We launched, detected, and imaged the polaritonic waves in real space and altered their wavelength by varying the number of crystal layers in our specimens. The measured dispersion of polaritonic waves was shown to be governed by the crystal thickness according to a scaling law that persists down to a few atomic layers. Our results are likely to hold true in other polar van der Waals crystals and may lead to new functionalities.

  17. Stoichiometry and thickness dependence of superconducting properties of niobium nitride thin films

    SciTech Connect

    Beebe, Melissa R. Beringer, Douglas B.; Burton, Matthew C.; Yang, Kaida; Lukaszew, R. Alejandra

    2016-03-15

    The current technology used in linear particle accelerators is based on superconducting radio frequency (SRF) cavities fabricated from bulk niobium (Nb), which have smaller surface resistance and therefore dissipate less energy than traditional nonsuperconducting copper cavities. Using bulk Nb for the cavities has several advantages, which are discussed elsewhere; however, such SRF cavities have a material-dependent accelerating gradient limit. In order to overcome this fundamental limit, a multilayered coating has been proposed using layers of insulating and superconducting material applied to the interior surface of the cavity. The key to this multilayered model is to use superconducting thin films to exploit the potential field enhancement when these films are thinner than their London penetration depth. Such field enhancement has been demonstrated in MgB{sub 2} thin films; here, the authors consider films of another type-II superconductor, niobium nitride (NbN). The authors present their work correlating stoichiometry and superconducting properties in NbN thin films and discuss the thickness dependence of their superconducting properties, which is important for their potential use in the proposed multilayer structure. While there are some previous studies on the relationship between stoichiometry and critical temperature T{sub C}, the authors are the first to report on the correlation between stoichiometry and the lower critical field H{sub C1}.

  18. Optical and surface characterization of amorphous boron nitride thin films for use as blood compatible coatings

    NASA Astrophysics Data System (ADS)

    Lousinian, S.; Kalfagiannis, N.; Logothetidis, S.

    2009-10-01

    The aim of this work is the investigation of the haemocompatibility properties of homogeneous and amorphous boron nitride (a-BN) thin films, through the adsorption of two basic blood plasma proteins, human serum albumin (HSA) and fibrinogen (Fib). The a-BN thin films were grown onto c-Si(100) substrates under different values of substrate bias voltage, employing the radio frequency (RF) magnetron sputtering technique. For the consideration of the optical, compositional and structural properties of the films, Spectroscopic Ellipsometry (SE) in the Vis-UV spectral region was used, while for the study of surface topography and surface charge distribution as well as of the wetting properties of the a-BN thin films, Atomic Force Microscopy (AFM), Electric Force Microscopy (EFM) and Contact Angle measurements were additionally employed. The properties of the thin films were correlated with their haemocompatibility, through the estimation of the ratio of HSA/Fib surface concentration. The sp 3 content of the samples does not seem to correlate with the haemocompatibility of the a-BN thin films. However, the surface properties determine the thrombogenicity potential of the studied samples. More precisely, the a-BN films with a less negatively charged surface exhibit the smallest possibility of clot formation, possibly due to the interactions between the charged chains of the Fib molecules and the a-BN surface, while slight changes in the surface roughness do not affect their haemocompatibility properties. The wetting properties determine the thickness of the adsorbed Fib as well as the ratio of HSA/Fib surface concentration.

  19. Synthesis and Characterization of Hexagonal Boron Nitride as a Gate Dielectric

    PubMed Central

    Jang, Sung Kyu; Youn, Jiyoun; Song, Young Jae; Lee, Sungjoo

    2016-01-01

    Two different growth modes of large-area hexagonal boron nitride (h-BN) film, a conventional chemical vapor deposition (CVD) growth mode and a high-pressure CVD growth mode, were compared as a function of the precursor partial pressure. Conventional self-limited CVD growth was obtained below a critical partial pressure of the borazine precursor, whereas a thick h-BN layer (thicker than a critical thickness of 10 nm) was grown beyond a critical partial pressure. An interesting coincidence of a critical thickness of 10 nm was identified in both the CVD growth behavior and in the breakdown electric field strength and leakage current mechanism, indicating that the electrical properties of the CVD h-BN film depended significantly on the film growth mode and the resultant film quality. PMID:27458024

  20. Microwave Characterization of Low-k Dielectric Thin Films using a Coplanar Waveguide

    NASA Astrophysics Data System (ADS)

    Radican, Kevin P.; Koeck, Deborah C.; Geerts, Wilhelmus; Spencer, Gregory; Donnelly, David; Galloway, Heather C.

    2003-03-01

    As microelectronic logic devices increase in speed the RC time delay is becoming of greater concern. One remedy is the use of low-k dielectrics along with less resistive metals such as Cu in back end processing. We have demonstrated a method of forming coplanar waveguides on low-k dielectric materials deposited on SiC/Si wafers. These thin films are prepared by the usual semiconductor industry methods. Then, the dielectric properties of the low-k dielectric thin films on wafers were measured at microwave frequencies using coplanar waveguide test structures. Several OSG low k materials were investigated before and after chemical mechanical planarization processing which involves placing the dielectrics in a liquid abrasive slurry. We will report on the details of the fabrication of the waveguide structures using argon laser beam lithography, magnetron sputter deposition, and reactive plasma etching. We will also report on the electrical changes observed due to the chemical processing. Electrical measurements were taken using an Agilent network analyzer, and Cascade Microtech probe station.

  1. Parametric formulation of the dielectric function of palladium and palladium hydride thin films.

    PubMed

    Vargas, William E; Azofeifa, Daniel E; Clark, Neville; Solis, Hugo; Montealegre, Felipe; Cambronero, Michael

    2014-08-20

    A parametric description of the dielectric function of Pd thin films with thicknesses between 10 and 30 nm is reported. These films were grown at room temperature on amorphous quartz substrates by electron beam evaporation, with a base pressure of 7.0×10(-7)  mbar. By using nonpolarized normal incident light, transmission spectra were measured for wavelengths between 240 and 1050 nm. Inversion of the spectra by means of a projected gradient method enables us to obtain the mean dielectric function of the Pd grains in the films. We follow the Brendel-Bormann model to describe the frequency dependence of the dielectric function, with the plasma frequency, collision frequency, and screening factor as parameters in the free electron term. The contributions of bound electrons and their interband transitions, described in terms of Lorentz oscillators, involve the resonance frequencies, decay times, strengths, and Gaussian widths as parameters of the model. All these parameters have been optimized from the Pd grains' dielectric function, which fits the transmission spectra. A similar procedure was followed for Pd films exposed to a hydrogen atmosphere close to one bar. Thus, the dielectric functions of palladium and palladium hydride can easily be calculated through spectral ranges covering near-ultraviolet, visible, and near-infrared wavelengths. This can be used to model the behavior of nano-sized structures in which palladium particles or thin films are exposed to hydrogen pressures close to one bar.

  2. The Propagation of Electromagnetic Waves in Thin Dielectric Slabs.

    DTIC Science & Technology

    1988-05-01

    Continue on reverse if recessary, and identify by block number) This report precents the solutions of Maxwell’s equations for the TE and TM modes of...field versus distance from slab center for two even and two odd TM modes .... 25 5. Electric field for TE even mode and magnetic field for TM even mode...34 vi1and/or ’it Special 6MEN Figures 6. Electric field versus distance from slab center for a slab of 0.35 [ tm thickness and dielectric coefficients of

  3. Scattering from thin dielectric straps surrounding a perfectly conducting structure

    NASA Technical Reports Server (NTRS)

    Al-Hekail, Zeyad; Gupta, Inder J.

    1989-01-01

    A method to calculate the electromagnetic scattered fields from a dielectric strap wrapped around convex, conducting structure is presented. A moment method technique is used to find the current excited within the strap by the incident plane wave. Then, Uniform Geometrical Theory of Diffraction (UTD) is used to compute the fields scattered by the strap. Reasonable agreement was obtained between the computed and the measured results. The results found in this study are useful in evaluating straps as a target support structure for scattering measurements.

  4. Polymer dielectric materials for organic thin-film transistors: Interfacial control and development for printable electronics

    NASA Astrophysics Data System (ADS)

    Kim, Choongik

    Organic thin-film transistors (OTFTs) have been extensively studied for organic electronics. In these devices, organic semiconductor-dielectric interface characteristics play a critical role in influencing OTFT operation and performance. This study begins with exploring how the physicochemical characteristics of the polymer gate dielectric affects the thin-film growth mode, microstructure, and OTFT performance parameters of pentacene films deposited on bilayer polymer (top)-SiO2 (bottom) dielectrics. Pentacene growth mode varies considerably with dielectric substrate, and correlations are established between pentacene film deposition temperature, the thin-film to bulk microstructural phase transition, and OTFT device performance. Furthermore, the primary influence of the polymer dielectric layer glass transition temperature on pentacene film microstructure and OTFT response is shown for the first time. Following the first study, the influence of the polymer gate dielectric viscoelastic properties on overlying organic semiconductor film growth, film microstructure, and TFT response are investigated in detail. From the knowledge that nanoscopically-confined thin polymer films exhibit glass transition temperatures that deviate substantially from those of the corresponding bulk materials, pentacene (p-channel) and cyanoperylene (n-channel) films grown on polymer gate dielectrics at temperatures well-below their bulk glass transition temperatures (Tg(b)) have been shown to exhibit morphological/microstructural transitions and dramatic OTFT performance discontinuities at well-defined temperatures (defined as the polymer "surface glass transition temperature," or Tg(s)). These transitions are characteristic of the particular polymer architecture and independent of film thickness or overall film cooperative chain dynamics. Furthermore, by analyzing the pentacene films grown on UV-curable polymer dielectrics with different curing times (hence, different degrees of

  5. Dielectric properties of barium strontium titanate (BST) thin films and phase shifters based on BST thin films

    NASA Astrophysics Data System (ADS)

    Zhou, Xiaoyuan

    In recent years, barium strontium titanate (abbreviated as BST) thin films have attracted extensive interest. Ferroelectric/dielectric behavior of BST is influenced by a number of structural factors, such as lattice tetragonality, defects, ratio of barium to strontium, grain size and etc. In this work several key issues regarding BST thin films have been studied. First, a clear correlation between lattice tetragonality and ferroelectric and dielectric behaviors has been established. The studied material was Ba 0.7Sr0.3TiO3. Grown on substrates like (LaAlO 3)0.3(Sr2AlTaO6)0.7, LaAlO 3, MgAl2O4, BST thin films were found to have distorted lattices. This distorted lattice structure leads to the enhanced in-plane dielectric and ferroelectric properties. The formation mechanism of the lattice distortion was studied in a model system consisting of a SrTiO 3 (film)/SiTiO3 (substrate) homostructure. Among several parameters, deposition pressure was identified to be the critical factors that determined the lattice parameters of the perovskite oxides. Secondly, a phenomenological model was developed to interpret the strain effect on the in-plane dielectric properties of BST thin films with different thickness. The theoretical modeling involved the grouping of strain into biaxial and hydrostatic components, the use of the Landau-Ginsburg-Devonshire formalism and mathematical calculations related to the elastic Gibbs free energy. The calculations confirmed that the ferroelectric transition temperature (Curie temperature) and dielectric constant decrease with the decreasing of film thickness. Thirdly, The heterostructure, SrTiO3/Si, was first prepared by laser molecular-beam epitaxy using an ultra-thin Sr layer as the buffer layer. X-ray diffraction measurements indicated that SrTiO3 was well crystallized and epitaxially aligned with Si. Cross-sectional observations by TEM and X-ray reflectivity measurements revealed that the SrTiO3/Si interface was sharp, smooth and fully

  6. Thermally driven sign switch of static dielectric constant of VO2 thin film

    NASA Astrophysics Data System (ADS)

    Kana Kana, J. B.; Vignaud, G.; Gibaud, A.; Maaza, M.

    2016-04-01

    Smart multifunctional materials exhibiting phase transition and tunable optical and/electrical properties provide a new direction towards engineering switchable devices. Specifically, the reversible, tunable and sign switch dielectric constants via external temperature stimuli observed in vanadium dioxide (VO2) make it a candidate of choice for tunable and switchable technologies devices. Here we report new aspect of the metal-insulator transition (MIT) through the sign switch of the static dielectric constant εS of pure VO2. As it is shown, the static dielectric constant showed an abrupt change from positive at T < 70 °C to negative at T > 70 °C. εS > 0 confirms the insulating phase where charges are localized while εS < 0 confirms the metallic phase of VO2 where charges are delocalized. We report for the first time the tunability of the dielectric constant from a negative sign for the static dielectric constant of VO2 thin film rarely found in real physical systems. We also demonstrate the tunability and switchability of the real and imaginary part of the dielectric constant (ε) via external temperature stimuli. More specifically, the real (ε) and Imaginary (ε) showed an abrupt thermal hysteresis which clearly confirms the phase transition.

  7. Oxide Thin-Film Transistors Fabricated Using Biodegradable Gate Dielectric Layer of Chicken Albumen

    NASA Astrophysics Data System (ADS)

    Jeon, Da-Bin; Bak, Jun-Yong; Yoon, Sung-Min

    2013-12-01

    An oxide thin-film transistor (TFT) using chicken albumen as gate dielectric on paper substrate was demonstrated. Chicken albumen, which was directly extracted from chicken egg white, was deposited as gate dielectric layer. An In-Ga-Zn-O was chosen as an active channel. The TFT feasibilities were successfully confirmed, in which channel mobility and subthreshold slope of the TFT were 6.48 cm2 V-1 s-1 and 1.28 V/s, respectively. This is the first report on the device configuration combining the biodegradable gate insulator and oxide semiconducting channel.

  8. Graphene-based thin film supercapacitor with graphene oxide as dielectric spacer

    NASA Astrophysics Data System (ADS)

    Liu, Jinzhang; Galpaya, Dilini; Notarianni, Marco; Yan, Cheng; Motta, Nunzio

    2013-08-01

    Thin film supercapacitors are produced by using electrochemically exfoliated graphene (G) and wet-chemically produced graphene oxide (GO). Either G/GO/G stacked film or sole GO film are sandwiched by two Au films to make devices, where GO is the dielectric spacer. The addition of graphene film can increase the capacitance about two times, compared to the simple Au electrode. It is found that the GO film has very high dielectric constant, accounting for the high capacitance. AC measurement reveals that the relative permittivity of GO is in the order of 104 within the frequency range of 0.1-70 Hz.

  9. High Temperature Annealing Studies on the Piezoelectric Properties of Thin Aluminum Nitride Films

    SciTech Connect

    Farrell, R.; Pagan, V.R.; Kabulski, A.; Kuchibhatla, S.; Harman, J.; Kasarla, K.R.; Rodak, L.E.; Hensel, J.P.; Famouri, P.; Korakakis, D.

    2008-01-01

    A Rapid Thermal Annealing (RTA) system was used to anneal sputtered and MOVPE-grown Aluminum Nitride (AlN) thin films at temperatures up to 1000°C in ambient and controlled environments. According to Energy Dispersive X-Ray Analysis (EDAX), the films annealed in an ambient environment rapidly oxidize after five minutes at 1000°C. Below 1000°C the films oxidized linearly as a function of annealing temperature which is consistent with what has been reported in literature [1]. Laser Doppler Vibrometry (LDV) was used to measure the piezoelectric coefficient, d33, of these films. Films annealed in an ambient environment had a weak piezoelectric response indicating that oxidation on the surface of the film reduces the value of d33. A high temperature furnace has been built that is capable of taking in-situ measurements of the piezoelectric response of AlN films. In-situ d33 measurements are recorded up to 300°C for both sputtered and MOVPE-grown AlN thin films. The measured piezoelectric response appears to increase with temperature up to 300°C possibly due to stress in the film.

  10. Near-infrared electroluminescence at room temperature from neodymium-doped gallium nitride thin films

    SciTech Connect

    Kim, Joo Han; Holloway, Paul H.

    2004-09-06

    Strong near-infrared (NIR) electroluminescence (EL) at room temperature from neodymium (Nd)-doped gallium nitride (GaN) thin films is reported. The Nd-doped GaN films were grown by radio-frequency planar magnetron cosputtering of separate GaN and metallic Nd targets in a pure nitrogen ambient. X-ray diffraction data did not identify the presence of any secondary phases and revealed that the Nd-doped GaN films had a highly textured wurtzite crystal structure with the c-axis normal to the surface of the film. The EL devices were fabricated with a thin-film multilayered structure of Al/Nd-doped GaN/Al{sub 2}O{sub 3}-TiO{sub 2}/indium-tin oxide and tested at room temperate. Three distinct NIR EL emission peaks were observed from the devices at 905, 1082, and 1364 nm, arising from the radiative relaxation of the {sup 4}F{sub 3sol2} excited-state energy level to the {sup 4}I{sub 9sol2}, {sup 4}I{sub 11sol2}, and {sup 4}I{sub 13sol2} levels of the Nd{sup 3+} ion, respectively. The threshold voltage for all the three emission peaks was {approx}150 V. The external power efficiency of the fabricated EL devices was {approx}1x10{sup -5} measured at 40 V above the threshold voltage.

  11. Thin-walled boron nitride microtubes exhibiting intense band-edge UV emission at room temperature

    NASA Astrophysics Data System (ADS)

    Huang, Yang; Bando, Yoshio; Tang, Chengchun; Zhi, Chunyi; Terao, Takeshi; Dierre, Benjamin; Sekiguchi, Takashi; Golberg, Dmitri

    2009-02-01

    Boron nitride (BN) microtubes were synthesized in a vertical induction furnace using Li2CO3 and B reactants. Their structures and morphologies were investigated using x-ray diffraction, scanning and transmission electron microscopy, and energy-dispersive x-ray spectroscopy. The microtubes have diameters of 1-3 µm, lengths of up to hundreds of micrometers, and well-structured ultrathin walls only ~50 nm thick. A mechanism combining the vapor-liquid-solid (VLS) and template self-sacrificing processes is proposed to explain the formation of these novel one-dimensional microstructures, in which the Li2O-B2O3 eutectic reaction plays an important role. Cathodoluminescence studies show that even at room temperature the thin-walled BN microtubes can possess an intense band-edge emission at ~216.5 nm, which is distinct compared with other BN nanostructures. The study suggests that the thin-walled BN microtubes should be promising for constructing compact deep UV devices and find potential applications in microreactors and microfluidic and drug delivery systems.

  12. Epitaxial growth and physical properties of ternary nitride thin films by polymer-assisted deposition

    SciTech Connect

    Enriquez, Erik M.; Zhang, Yingying; Chen, Aiping; Bi, Zhenxing; Wang, Yongqiang; Fu, Engang; Harrell, Zachary John; Lu, Xujie; Dowden, Paul Charles; Wang, Haiyan; Chen, Chonglin; Jia, Quanxi

    2016-08-26

    Epitaxial layered ternary metal-nitride FeMoN2, (Fe0.33 Mo0.67)MoN2, CoMoN2, and FeWN2 thin films have been grown on c-plane sapphire substrates by polymer-assisted deposition. The ABN2 layer sits on top of the oxygen sublattices of the substrate with three possible matching configurations due to the significantly reduced lattice mismatch. The doping composition and elements affect not only the out-of-plane lattice parameters but also the temperature-dependent electrical properties. These films have resistivity in the range of 0.1–1 mΩ·cm, showing tunable metallic or semiconducting behaviors by adjusting the composition. A modified parallel connection channel model has been used to analyze the grain boundary and Coulomb blockade effect on the electrical properties. Furthermore, the growth of the high crystallinity layered epitaxial thin films provides an avenue to study the composition-structure-property relationship in ABN2 materials through A and B-site substitution.

  13. Epitaxial growth and physical properties of ternary nitride thin films by polymer-assisted deposition

    DOE PAGES

    Enriquez, Erik M.; Zhang, Yingying; Chen, Aiping; ...

    2016-08-26

    Epitaxial layered ternary metal-nitride FeMoN2, (Fe0.33 Mo0.67)MoN2, CoMoN2, and FeWN2 thin films have been grown on c-plane sapphire substrates by polymer-assisted deposition. The ABN2 layer sits on top of the oxygen sublattices of the substrate with three possible matching configurations due to the significantly reduced lattice mismatch. The doping composition and elements affect not only the out-of-plane lattice parameters but also the temperature-dependent electrical properties. These films have resistivity in the range of 0.1–1 mΩ·cm, showing tunable metallic or semiconducting behaviors by adjusting the composition. A modified parallel connection channel model has been used to analyze the grain boundary andmore » Coulomb blockade effect on the electrical properties. Furthermore, the growth of the high crystallinity layered epitaxial thin films provides an avenue to study the composition-structure-property relationship in ABN2 materials through A and B-site substitution.« less

  14. Resistive switching phenomena of tungsten nitride thin films with excellent CMOS compatibility

    SciTech Connect

    Hong, Seok Man; Kim, Hee-Dong; An, Ho-Myoung; Kim, Tae Geun

    2013-12-15

    Graphical abstract: - Highlights: • The resistive switching characteristics of WN{sub x} thin films. • Excellent CMOS compatibility WN{sub x} films as a resistive switching material. • Resistive switching mechanism revealed trap-controlled space charge limited conduction. • Good endurance and retention properties over 10{sup 5} cycles, and 10{sup 5} s, respectively - Abstract: We report the resistive switching (RS) characteristics of tungsten nitride (WN{sub x}) thin films with excellent complementary metal-oxide-semiconductor (CMOS) compatibility. A Ti/WN{sub x}/Pt memory cell clearly shows bipolar RS behaviors at a low voltage of approximately ±2.2 V. The dominant conduction mechanisms at low and high resistance states were verified by Ohmic behavior and trap-controlled space-charge-limited conduction, respectively. A conducting filament model by a redox reaction explains the RS behavior in WN{sub x} films. We also demonstrate the memory characteristics during pulse operation, including a high endurance over >10{sup 5} cycles and a long retention time of >10{sup 5} s.

  15. The structure study of thin semiconductor and dielectric films by diffraction of synchrotron radiation

    NASA Astrophysics Data System (ADS)

    Yurjev, G. S.; Fainer, N. I.; Maximovskiy, E. A.; Kosinova, M. L.; Sheromov, M. A.; Rumyantsev, Yu. M.

    1998-02-01

    The structure of semiconductor and dielectric thin (100-300 nm) films was studied by diffraction of synchrotron radiation. The diffraction experiments were performed at both the station "Anomalous scattering" of the storage ring synchrotron facility VEPP-3 and DRON-4 diffractometer. The structure of CdS thin films grown on fused silica, single Si(100) and InP(100) substrates was investigated. The structure of Cu 2S thin films grown on fused silica, single Si(100) substrates and CdS/Si(100)-heterostructure was studied. The structure study was performed on Si 3N 4 films grown on GaAs(100) substrates. The structure of thin BN layers grown on single Si(100) substrates was studied. It was established that structural parameters of above-mentioned thin films coincide on the parameters of JCPDS International Centre for Diffraction Data.

  16. Investigation of high-k yttrium copper titanate thin films as alternative gate dielectrics

    NASA Astrophysics Data System (ADS)

    Grazia Monteduro, Anna; Ameer, Zoobia; Rizzato, Silvia; Martino, Maurizio; Caricato, Anna Paola; Tasco, Vittorianna; Chaitanya Lekshmi, Indira; Hazarika, Abhijit; Choudhury, Debraj; Sarma, D. D.; Maruccio, Giuseppe

    2016-10-01

    Nearly amorphous high-k yttrium copper titanate thin films deposited by laser ablation were investigated in both metal-oxide-semiconductor (MOS) and metal-insulator-metal (MIM) junctions in order to assess the potentialities of this material as a gate oxide. The trend of dielectric parameters with film deposition shows a wide tunability for the dielectric constant and AC conductivity, with a remarkably high dielectric constant value of up to 95 for the thick films and conductivity as low as 6  ×  10-10 S cm-1 for the thin films deposited at high oxygen pressure. The AC conductivity analysis points out a decrease in the conductivity, indicating the formation of a blocking interface layer, probably due to partial oxidation of the thin films during cool-down in an oxygen atmosphere. Topography and surface potential characterizations highlight differences in the thin film microstructure as a function of the deposition conditions; these differences seem to affect their electrical properties.

  17. Monitoring Dielectric Thin-Film Production on Product Wafers Using Infrared Emission Spectroscopy

    SciTech Connect

    NIEMCZYK,THOMAS M.; ZHANG,SONGBIAO; HAALAND,DAVID M.

    2000-12-18

    Monitoring of dielectric thin-film production in the microelectronics industry is generally accomplished by depositing a representative film on a monitor wafer and determining the film properties off line. One of the most important dielectric thin films in the manufacture of integrated circuits is borophosphosilicate glass (BPSG). The critical properties of BPSG thin films are the boron content, phosphorus content and film thickness. We have completed an experimental study that demonstrates that infrared emission spectroscopy coupled with multivariate analysis can be used to simultaneous y determine these properties directly from the spectra of product wafers, thus eliminating the need of producing monitor wafers. In addition, infrared emission data can be used to simultaneously determine the film temperature, which is an important film production parameter. The infrared data required to make these determinations can be collected on a time scale that is much faster than the film deposition time, hence infrared emission is an ideal candidate for an in-situ process monitor for dielectric thin-film production.

  18. Dielectric Scattering Patterns for Efficient Light Trapping in Thin-Film Solar Cells.

    PubMed

    van Lare, Claire; Lenzmann, Frank; Verschuuren, Marc A; Polman, Albert

    2015-08-12

    We demonstrate an effective light trapping geometry for thin-film solar cells that is composed of dielectric light scattering nanocavities at the interface between the metal back contact and the semiconductor absorber layer. The geometry is based on resonant Mie scattering. It avoids the Ohmic losses found in metallic (plasmonic) nanopatterns, and the dielectric scatterers are well compatible with nearly all types of thin-film solar cells, including cells produced using high temperature processes. The external quantum efficiency of thin-film a-Si:H solar cells grown on top of a nanopatterned Al-doped ZnO, made using soft imprint lithography, is strongly enhanced in the 550-800 nm spectral band by the dielectric nanoscatterers. Numerical simulations are in good agreement with experimental data and show that resonant light scattering from both the AZO nanostructures and the embedded Si nanostructures are important. The results are generic and can be applied on nearly all thin-film solar cells.

  19. Effective method to study the thickness-dependent dielectric functions of nanometal thin film.

    PubMed

    Hu, Er-Tao; Cai, Qing-Yuan; Zhang, Rong-Jun; Wei, Yan-Feng; Zhou, Wen-Chao; Wang, Song-You; Zheng, Yu-Xiang; Wei, Wei; Chen, Liang-Yao

    2016-11-01

    A new method for measuring the dielectric functions change with the thickness of nanometal thin films was proposed. To confirm the accuracy and reliability of the method, a nano-thin wedge-shaped gold (Au) film with continuously varied thicknesses was designed and prepared on K9 glass by direct-current-sputtering (DC-sputtering). The thicknesses and the dielectric functions in the wavelength range of 300-1100 nm of the nano-thin Au films were obtained by fitting the ellipsometric parameters with the Drude and critical points model. Results show that while the real part of the dielectric function (ϵ1) changes marginally with increasing film thickness, the imaginary part (ϵ2) decreases drastically with the film thickness, approaching a stable value when the film thickness increases up to about 42 nm. This method is particularly useful in the study of thickness-dependent optical properties of nano-thin film.

  20. Structural and dielectric study of parylene C thin films

    NASA Astrophysics Data System (ADS)

    Kahouli, A.; Sylvestre, A.; Ortega, L.; Jomni, F.; Yangui, B.; Maillard, M.; Berge, B.; Robert, J.-C.; Legrand, J.

    2009-04-01

    α, β, and γ relaxation mechanisms have been identified in semicrystalline (45% of crystallinity) parylene-C (-H2C-C6H3Cl-CH2-)n films. C-Cl bonds induce the β-relaxation and explain increase in the dielectric constant as the frequency decreases in usual temperatures of operation for devices incorporating parylene-C. At cryogenic temperature (<-20 °C), γ-relaxation is assigned to the local motions of phenyl groups. Both β and γ relaxation processes obey an Arrhenius law with activation energy Ea(β)=91.7 kJ/mole and Ea(γ)=8.68 kJ/mole. α-relaxation associated with cooperative segmental motions of the (-H2C-∅-CH2-)n chains is observed with a peak at 10-2 Hz for T =80 °C and follows a Vogel-Fulcher-Tamman-Hesse law.

  1. Free-Space Time-Domain Method for Measuring Thin Film Dielectric Properties

    DOEpatents

    Li, Ming; Zhang, Xi-Cheng; Cho, Gyu Cheon

    2000-05-02

    A non-contact method for determining the index of refraction or dielectric constant of a thin film on a substrate at a desired frequency in the GHz to THz range having a corresponding wavelength larger than the thickness of the thin film (which may be only a few microns). The method comprises impinging the desired-frequency beam in free space upon the thin film on the substrate and measuring the measured phase change and the measured field reflectance from the reflected beam for a plurality of incident angles over a range of angles that includes the Brewster's angle for the thin film. The index of refraction for the thin film is determined by applying Fresnel equations to iteratively calculate a calculated phase change and a calculated field reflectance at each of the plurality of incident angles, and selecting the index of refraction that provides the best mathematical curve fit with both the dataset of measured phase changes and the dataset of measured field reflectances for each incident angle. The dielectric constant for the thin film can be calculated as the index of refraction squared.

  2. Thermally conductive, dielectric PCM-boron nitride nanosheet composites for efficient electronic system thermal management.

    PubMed

    Yang, Zhi; Zhou, Lihui; Luo, Wei; Wan, Jiayu; Dai, Jiaqi; Han, Xiaogang; Fu, Kun; Henderson, Doug; Yang, Bao; Hu, Liangbing

    2016-11-24

    Phase change materials (PCMs) possessing ideal properties, such as superior mass specific heat of fusion, low cost, light weight, excellent thermal stability as well as isothermal phase change behavior, have drawn considerable attention for thermal management systems. Currently, the low thermal conductivity of PCMs (usually less than 1 W mK(-1)) greatly limits their heat dissipation performance in thermal management applications. Hexagonal boron nitride (h-BN) is a two-dimensional material known for its excellent thermally conductive and electrically insulating properties, which make it a promising candidate to be used in electronic systems for thermal management. In this work, a composite, consisting of h-BN nanosheets (BNNSs) and commercialized paraffin wax was developed, which inherits high thermally conductive and electrically insulating properties from BNNSs and substantial heat of fusion from paraffin wax. With the help of BNNSs, the thermal conductivity of wax-BNNS composites reaches 3.47 W mK(-1), which exhibits a 12-time enhancement compared to that of pristine wax (0.29 W mK(-1)). Moreover, an 11.3-13.3 MV m(-1) breakdown voltage of wax-BNNS composites was achieved, which shows further improved electrical insulating properties. Simultaneously enhanced thermally conductive and electrically insulating properties of wax-BNNS composites demonstrate their promising application for thermal management in electronic systems.

  3. Effect of hydrogen addition on the deposition of titanium nitride thin films in nitrogen added argon magnetron plasma

    NASA Astrophysics Data System (ADS)

    Saikia, P.; Bhuyan, H.; Diaz-Droguett, D. E.; Guzman, F.; Mändl, S.; Saikia, B. K.; Favre, M.; Maze, J. R.; Wyndham, E.

    2016-06-01

    The properties and performance of thin films deposited by plasma assisted processes are closely related to their manufacturing techniques and processes. The objective of the current study is to investigate the modification of plasma parameters occurring during hydrogen addition in N2  +  Ar magnetron plasma used for titanium nitride thin film deposition, and to correlate the measured properties of the deposited thin film with the bulk plasma parameters of the magnetron discharge. From the Langmuir probe measurements, it was observed that the addition of hydrogen led to a decrease of electron density from 8.6 to 6.2  ×  (1014 m-3) and a corresponding increase of electron temperature from 6.30 to 6.74 eV. The optical emission spectroscopy study reveals that with addition of hydrogen, the density of argon ions decreases. The various positive ion species involving hydrogen are found to increase with increase of hydrogen partial pressure in the chamber. The thin films deposited were characterized using standard surface diagnostic tools such as x-ray photoelectron spectroscopy (XPS), secondary ion mass spectrometry (SIMS), x-ray diffraction (XRD), Raman spectroscopy (RS), scanning electron microscopy (SEM) and energy dispersive x-ray spectroscopy (EDS). Although it was possible to deposit thin films of titanium nitride with hydrogen addition in nitrogen added argon magnetron plasma, the quality of the thin films deteriorates with higher hydrogen partial pressures.

  4. Interferometric sensing platform with dielectric nanostructured thin films.

    PubMed

    Celo, D; Post, E; Summers, M; Smy, T; Brett, M J; Albert, J

    2009-04-13

    A new interferometer-based optical sensing platform with nanostructured thin films of ZrO2 or TiO2 as sensing environment has been developed. With the application of an IC compatible Si(3)N(4) waveguide technology, Mach-Zehnder interferometer devices have been fabricated. The application of the glancing angle deposition technique allowed fabrication of nanostructured thin films as the optical sensing environment. Sensing ability of fabricated devices has been demonstrated through the refractive index measurement of a known gas. The transmission spectra and time response measurements have demonstrated a maximum phase shift of Delta phi=pi/10 and a |Delta P(out)|=0.65 dBm. Devices with TiO2 film on the sensing region performed much better than devices with ZrO2, with sensitivity twice as high.

  5. Integration of metal-organic frameworks into an electrochemical dielectric thin film for electronic applications

    PubMed Central

    Li, Wei-Jin; Liu, Juan; Sun, Zhi-Hua; Liu, Tian-Fu; Lü, Jian; Gao, Shui-Ying; He, Chao; Cao, Rong; Luo, Jun-Hua

    2016-01-01

    The integration of porous metal-organic frameworks onto the surface of materials, for use as functional devices, is currently emerging as a promising approach for gas sensing and flexible displays. However, research focused on potential applications in electronic devices is in its infancy. Here we present a facile strategy by which interpenetrated, crystalline metal-organic framework films are deposited onto conductive metal-plate anodes via in situ temperature-controlled electrochemical assembly. The nanostructure of the surface as well as the thickness and uniformity of the film are well controlled. More importantly, the resulting films exhibit enhanced dielectric properties compared to traditional inorganic or organic gate dielectrics. This study demonstrates the successful implementation of the rational design of metal-organic framework thin films on conductive supports with high-performance dielectric properties. PMID:27282348

  6. Morphology, Structural and Dielectric Properties of Vacuum Evaporated V2O5 Thin Films

    NASA Astrophysics Data System (ADS)

    Sengodan, R.; Shekar, B. Chandar; Sathish, S.

    Vanadium pentoxide (V2O5) thin films were deposited on well cleaned glass substrate using evaporation technique under the pressure of 10-5 Torr. The thickness of the films was measured by the multiple beam interferometry technique and cross checked by using capacitance method. Metal-Insulator-Metal (MIM) structure was fabricated by using suitable masks to study dielectric properties. The dielectric properties were studied by employing LCR meter in the frequency range 12 Hz to 100 kHz for various temperatures. The temperature co- efficient of permittivity (TCP), temperature co-efficient of capacitance (TCC) and dielectric constant (ɛ) were calculated. The activation energy was calculated and found to be very low. The activation energy was found to be increasing with increase in frequency. The obtained low value of activation energy suggested that the hopping conduction may be due to electrons rather than ions.

  7. Integration of metal-organic frameworks into an electrochemical dielectric thin film for electronic applications

    NASA Astrophysics Data System (ADS)

    Li, Wei-Jin; Liu, Juan; Sun, Zhi-Hua; Liu, Tian-Fu; Lü, Jian; Gao, Shui-Ying; He, Chao; Cao, Rong; Luo, Jun-Hua

    2016-06-01

    The integration of porous metal-organic frameworks onto the surface of materials, for use as functional devices, is currently emerging as a promising approach for gas sensing and flexible displays. However, research focused on potential applications in electronic devices is in its infancy. Here we present a facile strategy by which interpenetrated, crystalline metal-organic framework films are deposited onto conductive metal-plate anodes via in situ temperature-controlled electrochemical assembly. The nanostructure of the surface as well as the thickness and uniformity of the film are well controlled. More importantly, the resulting films exhibit enhanced dielectric properties compared to traditional inorganic or organic gate dielectrics. This study demonstrates the successful implementation of the rational design of metal-organic framework thin films on conductive supports with high-performance dielectric properties.

  8. Dielectric dilatometry on thin Teflon-PTFE films prepared by pulsed-laser deposition

    NASA Astrophysics Data System (ADS)

    Schwoediauer, Reinhard; Bauer-Gogonea, Simona; Bauer, Stefan; Heitz, J.; Arenholz, Enno; Baeuerle, Dieter

    1999-12-01

    Polytetrafluoroethylene (Teflon PTFE) films were grown by pulsed-laser deposition (PLD). Films prepared by ablation from press-sintered targets are found to be highly crystalline, with spherulite sizes adjustable over more than one order in magnitude by suitable thermal annealing. As revealed by dielectric dilatometry, PLD-PTFE films show characteristics remarkably similar to those of conventional PTFE, i.e. the same structural first-order phase transitions. Dielectric losses are low and indicate no tendency to film oxidation. PLD-PTFE films additionally show an excellent charge-stability, comparable and even superior to commercially available Teflon-PTFE foils. PLD-PTFE enlarges the family of Teflon materials and may thus become interesting for potential miniaturized electret devices. Furthermore, dielectric dilatometry provides an elegant means for the determination of the coefficient of thermal expansion in thin nonpolar films.

  9. In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics

    NASA Astrophysics Data System (ADS)

    Tsai, Meng-Chen; Lee, Min-Hung; Kuo, Chin-Lung; Lin, Hsin-Chih; Chen, Miin-Jang

    2016-11-01

    Amorphous and crystalline ZrO2 gate dielectrics treated with in situ atomic layer nitridation on the top and down regions (top and down nitridation, abbreviated as TN and DN) were investigated. In a comparison between the as-deposited amorphous DN and TN samples, the DN sample has a lower leakage current density (Jg) of ∼7 × 10-4 A/cm2 with a similar capacitance equivalent thickness (CET) of ∼1.53 nm, attributed to the formation of SiOxNy in the interfacial layer (IL). The post-metallization annealing (PMA) leads to the transformation of ZrO2 from the amorphous to the crystalline tetragonal/cubic phase, resulting in an increment of the dielectric constant. The PMA-treated TN sample exhibits a lower CET of 1.22 nm along with a similar Jg of ∼1.4 × 10-5 A/cm2 as compared with the PMA-treated DN sample, which can be ascribed to the suppression of IL regrowth. The result reveals that the nitrogen engineering in the top and down regions has a significant impact on the electrical characteristics of amorphous and crystalline ZrO2 gate dielectrics, and the nitrogen incorporation at the top of crystalline ZrO2 is an effective approach to scale the CET and Jg, as well as to improve the reliability.

  10. Thin-film composite materials as a dielectric layer for flexible metal-insulator-metal capacitors.

    PubMed

    Tiwari, Jitendra N; Meena, Jagan Singh; Wu, Chung-Shu; Tiwari, Rajanish N; Chu, Min-Ching; Chang, Feng-Chih; Ko, Fu-Hsiang

    2010-09-24

    A new organic-organic nanoscale composite thin-film (NCTF) dielectric has been synthesized by solution deposition of 1-bromoadamantane and triblock copolymer (Pluronic P123, BASF, EO20-PO70-EO20), in which the precursor solution has been achieved with organic additives. We have used a sol-gel process to make a metal-insulator-metal capacitor (MIM) comprising a nanoscale (10 nm-thick) thin-film on a flexible polyimide (PI) substrate at room temperature. Scanning electron microscope and atomic force microscope revealed that the deposited NCTFs were crack-free, uniform, highly resistant to moisture absorption, and well adhered on the Au-Cr/PI. The electrical properties of 1-bromoadamantane-P123 NCTF were characterized by dielectric constant, capacitance, and leakage current measurements. The 1-bromoadamantane-P123 NCTF on the PI substrate showed a low leakage current density of 5.5 x 10(-11) A cm(-2) and good capacitance of 2.4 fF at 1 MHz. In addition, the calculated dielectric constant of 1-bromoadamantane-P123 NCTF was 1.9, making them suitable candidates for use in future flexible electronic devices as a stable intermetal dielectric. The electrical insulating properties of 1-bromoadamantane-P123 NCTF have been improved due to the optimized dipole moments of the van der Waals interactions.

  11. A dielectric elastomer actuator thin membrane rotary motor

    NASA Astrophysics Data System (ADS)

    Anderson, Iain A.; Calius, Emilio P.; Gisby, Todd; Hale, Thom; McKay, Thomas; O'Brien, Benjamin; Walbran, Scott

    2009-03-01

    We describe a low profile and lightweight membrane rotary motor based on the dielectric elastomer actuator (DEA). In this motor phased actuation of electroded sectors of the motor membrane imparts orbital motion to a central gear that meshes with the rotor. Two motors were fabricated: a three phase and four phase with three electroded sectors (120°/sector) and four sectors (90°/sector) respectively. Square segments of 3M VHB4905 tape were stretched equibiaxially to 16 times their original area and each was attached to a rigid circular frame. Electroded sectors were actuated with square wave voltages up to 2.5kV. Torque/power characteristics were measured. Contactless orbiter displacements, measured with the rotor removed, were compared with simulation data calculated using a finite element model. A measured specific power of approximately 8mW/g (based on the DEA membrane weight), on one motor compares well with another motor technology. When the mass of the frame was included a peak specific power of 0.022mW/g was calculated. We expect that motor performance can be substantially improved by using a multilayer DEA configuration, enabling the delivery of direct drive high torques at low speeds for a range of applications. The motor is inherently scalable, flexible, flat, silent in operation, amenable to deposition-based manufacturing approaches, and uses relatively inexpensive materials.

  12. Organic/Inorganic Nano-hybrids with High Dielectric Constant for Organic Thin Film Transistor Applications

    NASA Astrophysics Data System (ADS)

    Yu, Yang-Yen; Jiang, Ai-Hua; Lee, Wen-Ya

    2016-11-01

    The organic material soluble polyimide (PI) and organic-inorganic hybrid PI-barium titanate (BaTiO3) nanoparticle dielectric materials (IBX, where X is the concentration of BaTiO3 nanoparticles in a PI matrix) were successfully synthesized through a sol-gel process. The effects of various BaTiO3 contents on the hybrid film performance and performance optimization were investigated. Furthermore, pentacene-based organic thin film transistors (OTFTs) with PI-BaTiO3/polymethylmethacrylate or cyclic olefin copolymer (COC)-modified gate dielectrics were fabricated and examined. The hybrid materials showed effective dispersion of BaTiO3 nanoparticles in the PI matrix and favorable thermal properties. X-ray diffraction patterns revealed that the BaTiO3 nanoparticles had a perovskite structure. The hybrid films exhibited high formability and planarity. The IBX hybrid dielectric films exhibited tunable insulating properties such as the dielectric constant value and capacitance in ranges of 4.0-8.6 and 9.2-17.5 nF cm-2, respectively. Adding the modified layer caused the decrease of dielectric constant values and capacitances. The modified dielectric layer without cross-linking displayed a hydrophobic surface. The electrical characteristics of the pentacene-based OTFTs were enhanced after the surface modification. The optimal condition for the dielectric layer was 10 wt% hybrid film with the COC-modified layer; moreover, the device exhibited a threshold voltage of 0.12 V, field-effect mobility of 4.32 × 10-1 cm2 V-1 s-1, and on/off current of 8.4 × 107.

  13. Organic/Inorganic Nano-hybrids with High Dielectric Constant for Organic Thin Film Transistor Applications.

    PubMed

    Yu, Yang-Yen; Jiang, Ai-Hua; Lee, Wen-Ya

    2016-12-01

    The organic material soluble polyimide (PI) and organic-inorganic hybrid PI-barium titanate (BaTiO3) nanoparticle dielectric materials (IBX, where X is the concentration of BaTiO3 nanoparticles in a PI matrix) were successfully synthesized through a sol-gel process. The effects of various BaTiO3 contents on the hybrid film performance and performance optimization were investigated. Furthermore, pentacene-based organic thin film transistors (OTFTs) with PI-BaTiO3/polymethylmethacrylate or cyclic olefin copolymer (COC)-modified gate dielectrics were fabricated and examined. The hybrid materials showed effective dispersion of BaTiO3 nanoparticles in the PI matrix and favorable thermal properties. X-ray diffraction patterns revealed that the BaTiO3 nanoparticles had a perovskite structure. The hybrid films exhibited high formability and planarity. The IBX hybrid dielectric films exhibited tunable insulating properties such as the dielectric constant value and capacitance in ranges of 4.0-8.6 and 9.2-17.5 nF cm(-2), respectively. Adding the modified layer caused the decrease of dielectric constant values and capacitances. The modified dielectric layer without cross-linking displayed a hydrophobic surface. The electrical characteristics of the pentacene-based OTFTs were enhanced after the surface modification. The optimal condition for the dielectric layer was 10 wt% hybrid film with the COC-modified layer; moreover, the device exhibited a threshold voltage of 0.12 V, field-effect mobility of 4.32 × 10(-1) cm(2) V(-1) s(-1), and on/off current of 8.4 × 10(7).

  14. Effect of longitudinal electric field on capillary instability of a thin axisymmetric layer of liquid dielectric coating a dielectric fiber

    NASA Astrophysics Data System (ADS)

    Korovin, V. M.

    2016-12-01

    The flow of a viscous dielectric liquid surrounded with a gas is investigated in the process of capillary disintegration of a thin axisymmetric liquid layer on an undeformable cylindrical dielectric fiber in a uniform electric field is investigated. An asymptotic analysis of the system of equations and hydrodynamic boundary conditions written with allowance for surface ponderomotive forces is carried out for the case when the average thickness of the layer is much smaller than the radius of the fiber cross section. The problem of the transition of the liquid configuration from the state of a stationary cylindrical layer to the hydrodynamic state in the form of a regular sequence of drops is formulated. In this formulation, a nonlinear parabolic equation that describes the evolution of the local thickness of the layer on the time interval to the instant of drop formation is derived. The effect of the key parameters on the capillary instability is analyzed based on the linearized version of the resultant equation and the linearized electrostatic problem of calculating the field perturbations.

  15. Optical properties of dielectric thin films including quantum dots

    NASA Astrophysics Data System (ADS)

    Flory, F.; Chen, Y. J.; Lee, C. C.; Escoubas, L.; Simon, J. J.; Torchio, P.; Le Rouzo, J.; Vedraine, S.; Derbal-Habak, Hassina; Ackermann, Jorg; Shupyk, Ivan; Didane, Yahia

    2010-08-01

    Depending on the minimum size of their micro/nano structure, thin films can exhibit very different behaviors and optical properties. From optical waveguides down to artificial anisotropy, through diffractive optics and photonic crystals, the application changes when decreasing the minimum feature size. Rigorous electromagnetic theory can be used to model most of the components but when the size is of a few nanometers, quantum theory has also to be used. These materials including quantum structures are of particular interest for other applications, in particular for solar cells, because of their luminescent and electronic properties. We show that the properties of electrons in multiple quantum wells can be easily modeled with a formalism similar to that used for multilayer waveguides. The effects of different parameters, in particular coupling between wells and well thickness dispersion, on possible discrete energy levels or energy band of electrons and on electron wave functions is given. When such quantum confinement appears the spectral absorption and the extinction coefficient dispersion with wavelength is modified. The dispersion of the real part of the refractive index can then be deduced from the Kramers- Krönig relations. Associated with homogenization theory this approach gives a new model of refractive index for thin films including quantum dots. Absorption spectra of samples composed of ZnO quantum dots in PMMA layers are in preparation are given.

  16. Adhesion, friction, and wear of plasma-deposited thin silicon nitride films at temperatures to 700 C

    NASA Technical Reports Server (NTRS)

    Miyoshi, K.; Pouch, J. J.; Alterovitz, S. A.; Pantic, D. M.; Johnson, G. A.

    1988-01-01

    The adhesion, friction, and wear behavior of silicon nitride films deposited by low- and high-frequency plasmas (30 kHz and 13.56 MHz) at various temperatures to 700 C in vacuum were examined. The results of the investigation indicated that the Si/N ratios were much greater for the films deposited at 13.56 MHz than for those deposited at 30 kHz. Amorphous silicon was present in both low- and high-frequency plasma-deposited silicon nitride films. However, more amorphous silicon occurred in the films deposited at 13.56 MHz than in those deposited at 30 kHz. Temperature significantly influenced adhesion, friction, and wear of the silicon nitride films. Wear occurred in the contact area at high temperature. The wear correlated with the increase in adhesion and friction for the low- and high-frequency plasma-deposited films above 600 and 500 C, respectively. The low- and high-frequency plasma-deposited thin silicon nitride films exhibited a capability for lubrication (low adhesion and friction) in vacuum at temperatures to 500 and 400 C, respectively.

  17. Correlation between bonding structure and microstructure in fullerenelike carbon nitride thin films

    SciTech Connect

    Gago, R.; Abendroth, B.; Moeller, W.; Jimenez, I.; Neidhardt, J.; Hultman, L.; Caretti, I.

    2005-03-15

    The bonding structure of highly ordered fullerenelike (FL) carbon nitride (CN{sub x}) thin films has been assessed by x-ray absorption near-edge spectroscopy (XANES). Samples with different degrees of FL character have been analyzed to discern spectral signatures related to the FL microstructure. The XANES spectra of FL-CN{sub x} films resemble that of graphitic CN{sub x}, evidencing the sp{sup 2} hybridization of both C and N atoms. The FL structure is achieved with the promotion of N in threefold positions over pyridinelike and cyanidelike bonding environments. In addition, the relative {pi}{sup *}/{sigma}* XANES intensity ratio at the C(1s) edge is independent of the FL character, while it decreases {approx}40% at the N(1s) edge with the formation of FL arrangements. This result indicates that there is no appreciable introduction of C-sp{sup 3} hybrids with the development of FL structures and, additionally, that a different spatial localization of {pi} electrons at C and N sites takes place in curved graphitic structures. The latter has implications for the elastic properties of graphene sheets and could, as such, explain the outstanding elastic properties of FL-CN{sub x}.

  18. Surface cleaning procedures for thin films of indium gallium nitride grown on sapphire

    NASA Astrophysics Data System (ADS)

    Douglass, K.; Hunt, S.; Teplyakov, A.; Opila, R. L.

    2010-12-01

    Surface preparation procedures for indium gallium nitride (InGaN) thin films were analyzed for their effectiveness for carbon and oxide removal as well as for the resulting surface roughness. Aqua regia (3:1 mixture of concentrated hydrochloric acid and concentrated nitric acid, AR), hydrofluoric acid (HF), hydrochloric acid (HCl), piranha solution (1:1 mixture of sulfuric acid and 30% H 2O 2) and 1:9 ammonium sulfide:tert-butanol were all used along with high temperature anneals to remove surface contamination. X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) were utilized to study the extent of surface contamination and surface roughness, respectively. The ammonium sulfide treatment provided the best overall removal of oxygen and carbon. Annealing over 700 °C after a treatment showed an even further improvement in surface contamination removal. The piranha treatment resulted in the lowest residual carbon, while the ammonium sulfide treatment leads to the lowest residual oxygen. AFM data showed that all the treatments decreased the surface roughness (with respect to as-grown specimens) with HCl, HF, (NH 4) 2S and RCA procedures giving the best RMS values (˜0.5-0.8 nm).

  19. Alternative process for thin layer etching: Application to nitride spacer etching stopping on silicon germanium

    SciTech Connect

    Posseme, N. Pollet, O.; Barnola, S.

    2014-08-04

    Silicon nitride spacer etching realization is considered today as one of the most challenging of the etch process for the new devices realization. For this step, the atomic etch precision to stop on silicon or silicon germanium with a perfect anisotropy (no foot formation) is required. The situation is that none of the current plasma technologies can meet all these requirements. To overcome these issues and meet the highly complex requirements imposed by device fabrication processes, we recently proposed an alternative etching process to the current plasma etch chemistries. This process is based on thin film modification by light ions implantation followed by a selective removal of the modified layer with respect to the non-modified material. In this Letter, we demonstrate the benefit of this alternative etch method in term of film damage control (silicon germanium recess obtained is less than 6 A), anisotropy (no foot formation), and its compatibility with other integration steps like epitaxial. The etch mechanisms of this approach are also addressed.

  20. Superconducting energy scales and anomalous dissipative conductivity in thin films of molybdenum nitride

    NASA Astrophysics Data System (ADS)

    Simmendinger, Julian; Pracht, Uwe S.; Daschke, Lena; Proslier, Thomas; Klug, Jeffrey A.; Dressel, Martin; Scheffler, Marc

    2016-08-01

    We report investigations of molybdenum nitride (MoN) thin films with different thickness and disorder and with superconducting transition temperature 9.89 K ≥Tc≥2.78 K . Using terahertz frequency-domain spectroscopy we explore the normal and superconducting charge carrier dynamics for frequencies covering the range from 3 to 38 cm-1 (0.1 to 1.1 THz). The superconducting energy scales, i.e., the critical temperature Tc, the pairing energy Δ , and the superfluid stiffness J , and the superfluid density ns can be well described within the Bardeen-Cooper-Schrieffer theory for conventional superconductors. At the same time, we find an anomalously large dissipative conductivity, which cannot be explained by thermally excited quasiparticles, but rather by a temperature-dependent normal-conducting fraction, persisting deep into the superconducting state. Our results on this disordered system constrain the regime, where discernible effects stemming from the disorder-induced superconductor-insulator transition possibly become relevant, to MoN films with a transition temperature lower than at least 2.78 K.

  1. Photochemical functionalization of gallium nitride thin films with molecular and biomolecular layers.

    PubMed

    Kim, Heesuk; Colavita, Paula E; Metz, Kevin M; Nichols, Beth M; Sun, Bin; Uhlrich, John; Wang, Xiaoyu; Kuech, Thomas F; Hamers, Robert J

    2006-09-12

    We demonstrate that photochemical functionalization can be used to functionalize and photopattern the surface of gallium nitride crystalline thin films with well-defined molecular and biomolecular layers. GaN(0001) surfaces exposed to a hydrogen plasma will react with organic molecules bearing an alkene (C=C) group when illuminated with 254 nm light. Using a bifunctional molecule with an alkene group at one end and a protected amine group at the other, this process can be used to link the alkene group to the surface, leaving the protected amine exposed. Using a simple contact mask, we demonstrate the ability to directly pattern the spatial distribution of these protected amine groups on the surface with a lateral resolution of <12 mum. After deprotection of the amines, single-stranded DNA oligonucleotides were linked to the surface using a bifunctional cross-linker. Measurements using fluorescently labeled complementary and noncomplementary sequences show that the DNA-modified GaN surfaces exhibit excellent selectivity, while repeated cycles of hybridization and denaturation in urea show good stability. These results demonstrate that photochemical functionalization can be used as an attractive starting point for interfacing molecular and biomolecular systems with GaN and other compound semiconductors.

  2. Poly-crystalline thin-film by aluminum induced crystallization on aluminum nitride substrate

    NASA Astrophysics Data System (ADS)

    Bhopal, Muhammad Fahad; Lee, Doo Won; Lee, Soo Hong

    2016-09-01

    Thin-film polycrystalline silicon ( pc-Si) on foreign (non-silicon) substrates has been researched by various research groups for the production of photovoltaic cells. High quality pc-Si deposition on foreign substrates with superior optical properties is considered to be the main hurdle in cell fabrication. Metal induced crystallization (MIC) is one of the renowned techniques used to produce this quality of material. In the current study, an aluminum induced crystallization (AIC) method was adopted to produce pc-Si thin-film on aluminum nitride (AlN) substrate by a seed layer approach. Aluminum and a-Si layer were deposited using an e-beam evaporator. Various annealing conditions were used in order to investigate the AIC grown pc-Si seed layers for process optimization. The effect of thermal annealing on grain size, defects preferentially crystallographic orientation of the grains were analyzed. Surface morphology was studied using an optical microscope. Poly-silicon film with a crystallinity fraction between 95-100% and an FWHM between 5-6 cm-1 is achievable at low temperatures and for short time intervals. A grain size of about 10 micron can be obtained at a low deposition rate on an AIN substrate. Similarly, Focused ion beam (FIB) also showed that at 425 °C sample B and at 400 °C sample A were fully crystallized. The crystalline quality of pc-Si was evaluated using μ-Raman spectroscopy as a function of annealed conditions and Grazing incidence X-ray diffraction (GIXRD) was used to determine the phase direction of the pc-Si layer. The current study implicates that a poly-silicon layer with good crystallographic orientation and crystallinity fraction is achievable on AIN substrate at low temperatures and short time frames.

  3. All-amorphous-oxide transparent, flexible thin-film transistors. Efficacy of bilayer gate dielectrics.

    PubMed

    Liu, Jun; Buchholz, D Bruce; Hennek, Jonathan W; Chang, Robert P H; Facchetti, Antonio; Marks, Tobin J

    2010-09-01

    Optically transparent and mechanically flexible thin-film transistors (TF-TFTs) composed exclusively of amorphous metal oxide films are fabricated on plastic substrates by combining an amorphous Ta(2)O(5)/SiO(x) bilayer transparent oxide insulator (TOI) gate dielectric with an amorphous zinc-indium-tin oxide (a-ZITO) transparent oxide semiconductor (TOS) channel and a-ZITO transparent oxide conductor (TOC) electrodes. The bilayer gate dielectric is fabricated by the post-cross-linking of vapor-deposited hexachlorodisiloxane-derived films to form thin SiO(x) layers (v-SiO(x)) on amorphous Ta(2)O(5) (a-Ta(2)O(5)) films grown by ion-assisted deposition at room temperature. The a-Ta(2)O(5)/v-SiO(x) bilayer TOI dielectric integrates the large capacitance of the high dielectric constant a-Ta(2)O(5) layer with the excellent dielectric/semiconductor interfacial compatibility of the v-SiO(x) layer in a-ZITO TOS-based TF-TFTs. These all-amorphous-oxide TF-TFTs, having a channel length and width of 100 and 2000 microm, respectively, perform far better than a-Ta(2)O(5)-only devices and exhibit saturation-regime field-effect mobilities of approximately 20 cm(2)/V x s, on-currents >10(-4) A, and current on-off ratios >10(5). These TFTs operate at low voltages (approximately 4.0 V) and exhibit good visible-region optical transparency and excellent mechanical flexibility.

  4. Textured ferroelectric thin films: Synthesis, characterization, and influence of compositional grading on the dielectric behavior

    NASA Astrophysics Data System (ADS)

    El-Naggar, Mohamed Y.

    This dissertation focuses on two topics concerning the connections between structure and property in ferroelectric thin films. First, the synthesis of highly oriented ferroelectric thin films is addressed, where the texture is needed to generate high strains that rely on electromechanical domain switching. The ferroelectric films are integrated with oxide electrodes onto single crystal MgO and Si substrates using biaxially-textured MgO as buffer layers. The second topic focuses on modeling the dielectric behavior of compositionally graded ferroelectrics. The functional ferroelectric PbxBa1- xTiO3 films are deposited by metalorganic chemical vapor deposition (MOCVD). SrRuO3, grown by pulsed laser deposition (PLD), is a lattice-matching electrode. Both the ferroelectric and oxide electrode layers are found to inherit the biaxial texture of the underlying MgO template, which can be deposited by ion beam assisted deposition (IBAD) directly on Si-based substrates. In addition, we demonstrated control of the ferroelectric film stoichiometry using a spectroscopic control loop that monitors the ultraviolet spectra of the gas-phase MOCVD precursors during growth. Detailed studies of the microstructural details of these films will be presented. The second topic of this thesis explores the dielectric behavior of functionally graded ferroelectric thin films. Homogenous ferroelectrics offer the possibility of engineering a tunable dielectric response for components in microwave circuits. However, this approach often leads to an undesired temperature sensitivity. Compositionally-graded BaxSr1- xTO3 ferroelectric films have been explored as a means of redressing this sensitivity, but experimental observations vary depending on geometry and other details. A continuum model is presented to calculate the capacitive response of graded ferroelectric films with realistic electrode geometries by accurately accounting for the polarization distribution and long-range electrostatic

  5. Thin dielectric film thickness determination by advanced transmission electron microscopy

    SciTech Connect

    Diebold, A.C.; Foran, B.; Kisielowski, C.; Muller, D.; Pennycook, S.; Principe, E.; Stemmer, S.

    2003-09-01

    High Resolution Transmission Electron Microscopy (HR-TEM) has been used as the ultimate method of thickness measurement for thin films. The appearance of phase contrast interference patterns in HR-TEM images has long been confused as the appearance of a crystal lattice by non-specialists. Relatively easy to interpret crystal lattice images are now directly observed with the introduction of annular dark field detectors for scanning TEM (STEM). With the recent development of reliable lattice image processing software that creates crystal structure images from phase contrast data, HR-TEM can also provide crystal lattice images. The resolution of both methods was steadily improved reaching now into the sub Angstrom region. Improvements in electron lens and image analysis software are increasing the spatial resolution of both methods. Optimum resolution for STEM requires that the probe beam be highly localized. In STEM, beam localization is enhanced by selection of the correct aperture. When STEM measurement is done using a highly localized probe beam, HR-TEM and STEM measurement of the thickness of silicon oxynitride films agree within experimental error. In this paper, the optimum conditions for HR-TEM and STEM measurement are discussed along with a method for repeatable film thickness determination. The impact of sample thickness is also discussed. The key result in this paper is the proposal of a reproducible method for film thickness determination.

  6. Deposition of magnesium nitride thin films on stainless steel-304 substrates by using a plasma focus device

    NASA Astrophysics Data System (ADS)

    Ramezani, Amir Hoshang; Habibi, Maryam; Ghoranneviss, Mahmood

    2014-08-01

    In this research, for the first time, we synthesize magnesium nitride thin films on 304-type stainless steel substrates using a Mather-type (2 kJ) plasma focus (PF) device. The films of magnesium nitride are coated with different number of focus shots (like 15, 25 and 35) at a distance of 8 cm from the anode tip and at 0° angular position with respect to the anode axis. For investigation of the structural properties and surface morphology of magnesium nitride films, we utilized the X-ray diffractometer (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM) analysis, respectively. Also, the elemental composition is characterized by energy-dispersive X-ray (EDX) analysis. Furthermore, Vicker's microhardness is used to study the mechanical properties of the deposited films. The results show that the degree of crystallinity of deposited thin films (from XRD), the average size of particles and surface roughness (from AFM), crystalline growth of structures (from SEM) and the hardness values of the films depend on the number of focus shots. The EDX analysis demonstrates the existence of the elemental composition of magnesium in the deposited samples.

  7. Effect of radio-frequency electric power applied to a boron nitride unbalanced magnetron sputter target on the deposition of cubic boron nitride thin film

    NASA Astrophysics Data System (ADS)

    Ko, Ji-Sun; Park, Jong-Keuk; Lee, Wook-Seong; Huh, Joo-Youl; Baik, Young-Joon

    2013-11-01

    Cubic boron nitride (c-BN) films were deposited by an unbalanced magnetron sputtering method. A (100) Si wafer with a nanocrystalline diamond thin film as a surface coating layer or that without it was used as a substrate. The target power was varied from 100 to 400 W. A boron nitride target was used, which was connected to a radio frequency power supply. High frequency power connected to a substrate holder was used for self-biasing. The deposition pressure was 0.27 MPa with a flow of Ar (18 sccm) — N2 (2 sccm) mixed gas. The existence of threshold bias voltages for c-BN formation and resputtering were observed irrespective of target power. The bias voltage window for c-BN formation broadened with increased target power. The deposition rate decreased with enhanced bias voltage and decreased target power. Residual stresses of the films did not vary noticeably with target power within the target power range of c-BN formation. A parameter space for c-BN formation according to the target power and the bias voltage, as two variables, was suggested.

  8. Optically activated sub-millimeter dielectric relaxation in amorphous thin film silicon at room temperature

    SciTech Connect

    Rahman, Rezwanur; Ohno, Tim R.; Taylor, P. C.; Scales, John A.

    2014-05-05

    Knowing the frequency-dependent photo-induced complex conductivity of thin films is useful in the design of photovoltaics and other semi-conductor devices. For example, annealing in the far-infrared could in principle be tailored to the specific dielectric properties of a particular sample. The frequency dependence of the conductivity (whether dark or photo-induced) also gives insight into the effective dimensionality of thin films (via the phonon density of states) as well as the presence (or absence) of free carriers, dopants, defects, etc. Ultimately, our goal is to make low-noise, phase-sensitive room temperature measurements of the frequency-dependent conductivity of thin films from microwave frequencies into the far-infrared; covering, the frequency range from ionic and dipole relaxation to atomic and electronic processes. To this end, we have developed a high-Q (quality factor) open cavity resonator capable of resolving the complex conductivity of sub-micron films in the range of 100–350 GHz (0.1–0.35 THz, or 0.4–1 meV). In this paper, we use a low-power green laser to excite bound charges in high-resistivity amorphous silicon thin film. Even at room temperature, we can resolve both the dark conductivity and photo-induced changes associated with dielectric relaxation and possibly some small portion of free carriers.

  9. Ultra-thin ohmic contacts for p-type nitride light emitting devices

    DOEpatents

    Raffetto, Mark [Raleigh, NC; Bharathan, Jayesh [Cary, NC; Haberern, Kevin [Cary, NC; Bergmann, Michael [Chapel Hill, NC; Emerson, David [Chapel Hill, NC; Ibbetson, James [Santa Barbara, CA; Li, Ting [Ventura, CA

    2012-01-03

    A semiconductor based Light Emitting Device (LED) can include a p-type nitride layer and a metal ohmic contact, on the p-type nitride layer. The metal ohmic contact can have an average thickness of less than about 25 .ANG. and a specific contact resistivity less than about 10.sup.-3 ohm-cm.sup.2.

  10. Galvanic corrosion of structural non-stoichiometric silicon nitride thin films and its implications on reliability of microelectromechanical devices

    SciTech Connect

    Broas, M. Mattila, T. T.; Paulasto-Kröckel, M.; Liu, X.; Ge, Y.

    2015-06-28

    This paper describes a reliability assessment and failure analysis of a poly-Si/non-stoichiometric silicon nitride thin film composite structure. A set of poly-Si/SiN{sub x} thin film structures were exposed to a mixed flowing gas (MFG) environment, which simulates outdoor environments, for 90 days, and an elevated temperature and humidity (85 °C/95% R.H.) test for 140 days. The mechanical integrity of the thin films was observed to degrade during exposure to the chemically reactive atmospheres. The degree of degradation was analyzed with nanoindentation tests. Statistical analysis of the forces required to initiate a fracture in the thin films indicated degradation due to the exposure to the MFG environment in the SiN{sub x} part of the films. Scanning electron microscopy revealed a porous-like reaction layer on top of SiN{sub x}. The morphology of the reaction layer resembled that of galvanically corroded poly-Si. Transmission electron microscopy further clarified the microstructure of the reaction layer which had a complex multi-phase structure extending to depths of ∼100 nm. Furthermore, the layer was oxidized two times deeper in a 90 days MFG-tested sample compared to an untested reference. The formation of the layer is proposed to be caused by galvanic corrosion of elemental silicon in non-stoichiometric silicon nitride during hydrofluoric acid etching. The degradation is proposed to be due uncontrolled oxidation of the films during the stress tests.

  11. Galvanic corrosion of structural non-stoichiometric silicon nitride thin films and its implications on reliability of microelectromechanical devices

    NASA Astrophysics Data System (ADS)

    Broas, M.; Liu, X.; Ge, Y.; Mattila, T. T.; Paulasto-Kröckel, M.

    2015-06-01

    This paper describes a reliability assessment and failure analysis of a poly-Si/non-stoichiometric silicon nitride thin film composite structure. A set of poly-Si/SiNx thin film structures were exposed to a mixed flowing gas (MFG) environment, which simulates outdoor environments, for 90 days, and an elevated temperature and humidity (85 °C/95% R.H.) test for 140 days. The mechanical integrity of the thin films was observed to degrade during exposure to the chemically reactive atmospheres. The degree of degradation was analyzed with nanoindentation tests. Statistical analysis of the forces required to initiate a fracture in the thin films indicated degradation due to the exposure to the MFG environment in the SiNx part of the films. Scanning electron microscopy revealed a porous-like reaction layer on top of SiNx. The morphology of the reaction layer resembled that of galvanically corroded poly-Si. Transmission electron microscopy further clarified the microstructure of the reaction layer which had a complex multi-phase structure extending to depths of ˜100 nm. Furthermore, the layer was oxidized two times deeper in a 90 days MFG-tested sample compared to an untested reference. The formation of the layer is proposed to be caused by galvanic corrosion of elemental silicon in non-stoichiometric silicon nitride during hydrofluoric acid etching. The degradation is proposed to be due uncontrolled oxidation of the films during the stress tests.

  12. Zirconium doped TiO2 thin films: A promising dielectric layer

    NASA Astrophysics Data System (ADS)

    Kumar, Arvind; Mondal, Sandip; Rao, K. S. R. Koteswara

    2016-05-01

    In the present work, we have fabricated the zirconium doped TiO2 thin (ZTO) films from a facile spin - coating method. The addition of Zirconium in TiO2 offers conduction band offset to Si and consequently decreased the leakage current density by approximately two orders as compared to pure TiO2 thin (TO) films. The ZTO thin film shows a high dielectric constant 27 with a very low leakage current density ˜10-8 A/cm2. The oxide capacitate, flat band voltage and change in flat band voltage are 172 pF, -1.19 V and 54 mV. The AFM analysis confirmed the compact and pore free flat surface. The RMS surface roughness is found to be 1.5 Å. The ellipsometry analysis also verified the fact with a high refractive index 2.21.

  13. Structure, composition and microwave dielectric properties of bismuth zinc niobate pyrochlore thin films

    NASA Astrophysics Data System (ADS)

    Wang, Zhao; Ren, Wei; Zhan, Xuelei; Shi, Peng; Wu, Xiaoqing

    2014-11-01

    (Bi1.5Zn0.5)(Zn0.5Nb1.5)O7 (BZN) pyrochlore thin films were deposited onto both Pt/TiO2/SiO2/Si and polycrystalline alumina substrates using pulsed laser deposition technique and then post-annealed using rapid thermal processing. The deposition temperature varies from 300 °C to 600 °C, and all the BZN films showed cubic pyrochlore structure after annealing at 650 °C for 30 min in air. The influence of the substrate associated with crystal structure is significant in the as-deposited films and disappears after post-annealing. The dielectric properties as a function of frequency up to the microwave frequency in both films were measured by LCR meter and split-post dielectric resonator technique. It is found that the BZN film deposited at 400 °C and post-annealed at 650 °C shows excellent dielectric properties with low loss in the microwave frequency range. This result indicates that the BZN thin film is a potential microwave material.

  14. Investigation of structural, optical, electrical and dielectric properties of catalytic sprayed hausmannite thin film

    SciTech Connect

    Larbi, T.; Ouni, B.; Boukhachem, A.; Boubaker, K. Amlouk, M.

    2014-12-15

    Hausmannite Mn{sub 3}O{sub 4} thin film have been synthesized using spray pyrolysis method. These films are characterized using X-ray diffraction (XRD), atomic force microscope AFM, UV–vis–NIR spectroscopy and impedance spectroscopy. XRD study confirms the tetragonal structure of the as-deposited films with lattice parameters, a = 5.1822 Å and c = 9.4563 Å and a grain size of about 56 nm. UV–vis–NIR spectroscopy was further used to estimate optical constants such as extinction coefficient, refractive index, band gap and Urbach energy. Moreover, impedance spectroscopy analysis was employed to estimate electrical and dielectrical properties of the sprayed thin films. The activation energy values deduced from DC conductivity and relaxation frequency were almost the same, revealing that the transport phenomena is thermally activated by hopping between localized states. The AC conductivity is found to be proportional to ω{sup s}. The temperature dependence of the AC conductivity and the frequency exponent, s was reasonably well interpreted in terms of the correlated barrier-hopping CBH model. The dielectric properties were sensitive to temperature and frequency. The study of the electrical modulus indicated that the charge carrier was localized. Experimental results concerning optical constants as Urbach energy, dielectric constant, electric modulus and AC and DC conductivity were discussed in terms of the hopping model as suggested by Elliott.

  15. Temperature Dependence of Dielectric and Ferroelectric Properties of BiFeO3 Thin Films

    SciTech Connect

    Biegalski, Michael D; Jang, J H; Bark, C; Eom, Professor Chang-Beom

    2009-01-01

    Multiferroic materials, with their potential for novel devices and sensors, have spurred an immense amount of research. The most concentrated effort has been on BiFeO3 thin films due to their high N el temperature and high ferroelectric transition temperature. Most studies on BiFeO3 films suffer from electrical leakage, requiring the measurement of dielectric or ferroelectric properties to be conducted at low temperatures. In this work we show that room-temperature leakage is not intrinsic to BiFeO3. Results are shown for highly insulating films, including the temperature dependence (10K to 300K) of the dielectric properties, ferroelectric P-E loops, and leakage current. This data shows very little temperature change in the dielectric constant with a TCC of 0.38 K-1, and dielectric losses below 0.005. The remanent polarization similarly showed no temperature dependence within the error of the measurement with a Pr of 67 1 C/cm2. The leakage current remains below 3x10-4(A/cm2) at 100 kV/cm. This work proves that BiFeO3 does not intrinsically have high leakage, and validates the extrapolation of the properties of BiFeO3 films measured at low temperatures to room temperatures.

  16. Solution processed lanthanum aluminate gate dielectrics for use in metal oxide-based thin film transistors

    SciTech Connect

    Esro, M.; Adamopoulos, G.; Mazzocco, R.; Kolosov, O.; Krier, A.; Vourlias, G.; Milne, W. I.

    2015-05-18

    We report on ZnO-based thin-film transistors (TFTs) employing lanthanum aluminate gate dielectrics (La{sub x}Al{sub 1−x}O{sub y}) grown by spray pyrolysis in ambient atmosphere at 440 °C. The structural, electronic, optical, morphological, and electrical properties of the La{sub x}Al{sub 1−x}O{sub y} films and devices as a function of the lanthanum to aluminium atomic ratio were investigated using a wide range of characterization techniques such as UV-visible absorption spectroscopy, impedance spectroscopy, spectroscopic ellipsometry, atomic force microscopy, x-ray diffraction, and field-effect measurements. As-deposited LaAlO{sub y} dielectrics exhibit a wide band gap (∼6.18 eV), high dielectric constant (k ∼ 16), low roughness (∼1.9 nm), and very low leakage currents (<3 nA/cm{sup 2}). TFTs employing solution processed LaAlO{sub y} gate dielectrics and ZnO semiconducting channels exhibit excellent electron transport characteristics with hysteresis-free operation, low operation voltages (∼10 V), high on/off current modulation ratio of >10{sup 6}, subthreshold swing of ∼650 mV dec{sup −1}, and electron mobility of ∼12 cm{sup 2} V{sup −1} s{sup −1}.

  17. Comparative study on nitridation and oxidation plasma interface treatment for AlGaN/GaN MIS-HEMTs with AlN gate dielectric

    NASA Astrophysics Data System (ADS)

    Zhu, Jie-Jie; Ma, Xiao-Hua; Hou, Bin; Chen, Li-Xiang; Zhu, Qing; Hao, Yue

    2017-02-01

    This paper demonstrated the comparative study on interface engineering of AlN/AlGaN/GaN metal–insulator–semiconductor high-electron-mobility transistors (MIS-HEMTs) by using plasma interface pre-treatment in various ambient gases. The 15 nm AlN gate dielectric grown by plasma-enhanced atomic layer deposition significantly suppressed the gate leakage current by about two orders of magnitude and increased the peak field-effect mobility by more than 50%. NH3/N2 nitridation plasma treatment (NPT) was used to remove the 3 nm poor-quality interfacial oxide layer and N2O/N2 oxidation plasma treatment (OPT) to improve the quality of interfacial layer, both resulting in improved dielectric/barrier interface quality, positive threshold voltage (V th) shift larger than 0.9 V, and negligible dispersion. In comparison, however, NPT led to further decrease in interface charges by 3.38 × 1012 cm‑2 and an extra positive V th shift of 1.3 V. Analysis with fat field-effect transistors showed that NPT resulted in better sub-threshold characteristics and transconductance linearity for MIS-HEMTs compared with OPT. The comparative study suggested that direct removing the poor interfacial oxide layer by nitridation plasma was superior to improving the quality of interfacial layer by oxidation plasma for the interface engineering of GaN-based MIS-HEMTs.

  18. Organic Thin-Film Transistors Fabricated on Plastic Substrates with a Polymeric Gate Dielectrics

    NASA Astrophysics Data System (ADS)

    Lee, Jung Hun; Kim, Seong Hyun; Kim, Gi Heon; Lim, Sang Chul; Jang, Jin; Zyung, Taehyoung

    2003-05-01

    An organic thin-film transistor using pentacene as an active layer was fabricated on plastic substrate. An organic layer such as thermal curable polymer (JSS-362, Japan Synthetic Rubber (JSR)) was used as the gate dielectrics. The JSS-362 may act not only as a dielectric layer but also as a surface smoothing layer. From the electrical measurement, typical ID-VD characteristics of the field-effect transistor (FET) were observed. The field effect mobility μ was calculated to be 0.12 cm2\\cdotV-1\\cdots-1, while the threshold voltage VT was approximately -15 V. The on/off ratio was above 104 when VG was scanned from -75 V to +0 V.

  19. Low temperature dielectric relaxation and charged defects in ferroelectric thin films

    SciTech Connect

    Artemenko, A.; Payan, S.; Rousseau, A.; Arveux, E.; Maglione, M.; Levasseur, D.; Guegan, G.

    2013-04-15

    We report a dielectric relaxation in BaTiO{sub 3}-based ferroelectric thin films of different composition and with several growth modes: sputtering (with and without magnetron) and sol-gel. The relaxation was observed at cryogenic temperatures (T < 100 K) for frequencies from 100 Hz up to 10 MHz. This relaxation activation energy is always lower than 200 meV and is very similar to the relaxation that we reported in the parent bulk perovskites. Based on our Electron Paramagnetic Resonance (EPR) investigation, we ascribe this dielectric relaxation to the hopping of electrons among Ti{sup 3+}-V(O) charged defects. Being dependent on the growth process and on the amount of oxygen vacancies, this relaxation can be a useful probe of defects in actual integrated capacitors with no need for specific shaping.

  20. Development of dielectric barrier discharge plasma processing apparatus for mass spectrometry and thin film deposition

    NASA Astrophysics Data System (ADS)

    Majumdar, Abhijit; Hippler, Rainer

    2007-07-01

    Cost effective and a very simple dielectric barrier discharge plasma processing apparatus for thin film deposition and mass spectroscopic analysis of organic gas mixture has been described. The interesting features of the apparatus are the construction of the dielectric electrodes made of aluminum oxide or alumina (Al2O3) and glass and the generation of high ignition voltage from the spark plug transformer taken from car. Metal capacitor is introduced in between ground and oscilloscope to measure the executing power during the discharge and the average electron density in the plasma region. The organic polymer films have been deposited on Si (100) substrate using several organic gas compositions. The experimental setup provides a unique drainage system from the reaction chamber controlled by a membrane pump to suck out and remove the poisonous gases or residuals (cyanogens, H-CN, CHxNH2, etc.) which have been produced during the discharge of CH4/N2 mixture.

  1. Low-temperature CVD of iron, cobalt, and nickel nitride thin films from bis[di(tert-butyl)amido]metal(II) precursors and ammonia

    SciTech Connect

    Cloud, Andrew N.; Abelson, John R.; Davis, Luke M.; Girolami, Gregory S.

    2014-03-15

    Thin films of late transition metal nitrides (where the metal is iron, cobalt, or nickel) are grown by low-pressure metalorganic chemical vapor deposition from bis[di(tert-butyl)amido]metal(II) precursors and ammonia. These metal nitrides are known to have useful mechanical and magnetic properties, but there are few thin film growth techniques to produce them based on a single precursor family. The authors report the deposition of metal nitride thin films below 300 °C from three recently synthesized M[N(t-Bu){sub 2}]{sub 2} precursors, where M = Fe, Co, and Ni, with growth onset as low as room temperature. Metal-rich phases are obtained with constant nitrogen content from growth onset to 200 °C over a range of feedstock partial pressures. Carbon contamination in the films is minimal for iron and cobalt nitride, but similar to the nitrogen concentration for nickel nitride. X-ray photoelectron spectroscopy indicates that the incorporated nitrogen is present as metal nitride, even for films grown at the reaction onset temperature. Deposition rates of up to 18 nm/min are observed. The film morphologies, growth rates, and compositions are consistent with a gas-phase transamination reaction that produces precursor species with high sticking coefficients and low surface mobilities.

  2. Structural and optical characterization of pure Si-rich nitride thin films

    PubMed Central

    2013-01-01

    The specific dependence of the Si content on the structural and optical properties of O- and H-free Si-rich nitride (SiNx>1.33) thin films deposited by magnetron sputtering is investigated. A semiempirical relation between the composition and the refractive index was found. In the absence of Si-H, N-H, and Si-O vibration modes in the FTIR spectra, the transverse and longitudinal optical (TO-LO) Si-N stretching pair modes could be unambiguously identified using the Berreman effect. With increasing Si content, the LO and the TO bands shifted to lower wavenumbers, and the LO band intensity dropped suggesting that the films became more disordered. Besides, the LO and the TO bands shifted to higher wavenumbers with increasing annealing temperature which may result from the phase separation between Si nanoparticles (Si-np) and the host medium. Indeed, XRD and Raman measurements showed that crystalline Si-np formed upon 1100°C annealing but only for SiNx<0.8. Besides, quantum confinement effects on the Raman peaks of crystalline Si-np, which were observed by HRTEM, were evidenced for Si-np average sizes between 3 and 6 nm. A contrario, visible photoluminescence (PL) was only observed for SiNx>0.9, demonstrating that this PL is not originating from confined states in crystalline Si-np. As an additional proof, the PL was quenched while crystalline Si-np could be formed by laser annealing. Besides, the PL cannot be explained neither by defect states in the bandgap nor by tail to tail recombination. The PL properties of SiNx>0.9 could be then due to a size effect of Si-np but having an amorphous phase. PMID:23324447

  3. Surface-sensitive UHV dielectric studies of nanoscale organic thin films: Adsorption, crystallization, and sublimation

    NASA Astrophysics Data System (ADS)

    Underwood, Jason M.

    Nanoscale systems are small collections of atoms or molecules, which as a result of their limited extent, show measurable thermodynamic deviations from bulk samples of the same species. The deviations may result from purely finite-size effects, or may be due to an increased significance of the interaction between the nanoscale system and its container. Ultra-thin (<100 nm) films of organic molecules adsorbed on surfaces afford unique opportunities to study the interplay of forces relevant to nanoscale physics. This thesis describes the development of a novel ultra-high vacuum apparatus to study the behavior of adsorbed polar molecules via dielectric spectroscopy (UHV-DS). Ultra-thin films are grown and characterized in-situ. The use of interdigitated electrode capacitors and a ratio-transformer bridge technique yields resolutions of ˜1 aF and ˜10-5 ppm in the capacitance and loss tangent, respectively. Typical sensitivity is 10 aF per monolayer at 80 K. Results are given for studies on water, methanol, and Cp* (a synthetic molecular rotor). The desorption event in the dielectric spectra is correlated with thermal desorption spectroscopy. During growth of methanol films, we observe partial crystallization for temperatures above ≳ 100 K. Crystallization is also observed upon heating glassy films grown at 80 K. Finally, we discuss UHV-DS as a probe for solid thin-film vapor pressure measurements, and show that our data on methanol compare favorably with those in the literature.

  4. Structural, Optical, and Dielectric Properties of Azure B Thin Films and Impact of Thermal Annealing

    NASA Astrophysics Data System (ADS)

    Zeyada, H. M.; Zidan, H. M.; Abdelghany, A. M.; Abbas, I.

    2017-03-01

    Thin films of azure B (AB) have been prepared by thermal evaporation. Structural, optical, and dielectric characteristics of as-prepared and annealed samples were studied. AB is polycrystalline in as-synthesized powder form. Detailed x-ray diffraction studies showed amorphous structure for pristine and annealed films. Fourier-transform infrared vibrational spectroscopy indicated minor changes in molecular bonds of AB thin films either after deposition or after thermal annealing. Optical transmittance and reflection spectra of prepared thin films were studied at nearly normal light incidence in the spectral range from 200 nm to 2500 nm, showing marked changes without new peaks. Annealing increased the absorption coefficient and decreased the optical bandgap. Onset and optical energy gaps of pristine films were found to obey indirect allowed transition with values of 1.10 eV and 2.64 eV, respectively. Annealing decreased the onset and optical energy gaps to 1.0 eV and 2.57 eV, respectively. The dispersion parameters before and after annealing are discussed in terms of a single-oscillator model. The spectra of the dielectric constants (ɛ 1, ɛ 2) were found to depend on the annealing temperature in addition to the incident photon energy.

  5. Analysis of high-kappa dielectric thin films with time-of-flight medium energy backscattering

    NASA Astrophysics Data System (ADS)

    Geil, Robert D.

    Time-of-flight medium backscattering (TOF-MEBS) is a powerful analytical technique for characterizing high-kappa dielectric thin films and their interface with Si. The amount of information that can be obtained from backscattering experiments can be maximized by carefully choosing a detailed thin film model for simulations and by implementing an experimental configuration that optimizes depth resolution. This thesis presents four main studies. In the first study a thin film model for simulating backscattering spectra is developed and used to extract interfacial information from thin dielectric films. A sufficient film model was found to consist of three layers: (1) dielectric material; (2) interfacial silicate; and (3) substrate. In the next study, the influence of multiple scattering and surface roughness on the shape of backscattering spectra was evaluated by generating spectra using Monte Carlo simulations. For TOF-MEBS analysis of thin (˜50 A) ZrO 2 films on Si, multiple scattering and surface roughness were found to have a negligible influence on the shape of a backscattering spectrum. The third study presents calculations and measurements of the energy and depth resolution of the TOF-MEBS system, and the experimental configuration for optimizing depth resolution was determined. For the analysis of thin films (˜50 A), the depth resolution of the TOF-MEBS system can be improved by operating at a beam energy around 150 keV and by using a glancing tilt angle (˜54°). However, if the angle is too glancing, multiple scattering and surface roughness can significantly degrade depth resolution and distort the shape of the backscattering spectrum. ZrO2 films deposited on H-terminated Si and native Si oxide surfaces were characterized with TOF-MEBS for the final study. The deposition surface was found to significantly affect the physical and chemical properties of MOCVD ZrO2 films and their interface with Si. ZrO2 films deposited on H-terminated Si are low in density

  6. Amorphous indium zinc oxide thin film transistors with poly-4-vinylphenol gate dielectric layers

    NASA Astrophysics Data System (ADS)

    Pu, Haifeng; Li, Guifeng; Feng, Jiahan; Liu, Baoying; Zhang, Qun

    2011-09-01

    Thin film transistors (TFTs) with amorphous indium zinc oxide (a-IZO) as channel layers and poly-4-vinylphenol as dielectric layers were fabricated. Transmission curves show that the double-layer structure of the a-IZO layer and the poly-4-vinylphenol layer exhibits the antireflection effect. It was found that post heat-treatment at relatively low temperature will improve the electrical performance of the transistors. TFT devices with saturation mobility of 25.4 cm2 V-1 s-1, threshold voltage of 4.0 V, subthreshold swing value of 0.88 V/decade and current on/off ratio of 106 were obtained.

  7. Detection of embedded ultra-subwavelength-thin dielectric features using elongated photonic nanojets.

    PubMed

    Ruiz, César Méndez; Simpson, Jamesina J

    2010-08-02

    Photonic nanojets have been previously shown (both theoretically and experimentally) to be highly sensitive to the presence of an ultra-subwavelength nanoscale particle within the nanojet. In the present work, photonic nanojets elongated by almost an order of magnitude (relative to the latest previously published work) are found to possess another key characteristic: they are sensitive to the presence of ultra-subwavelength nanoscale thin features embedded within a dielectric object. This additional characteristic of photonic nanojets is demonstrated through comparisons between fundamentally different 3-D and corresponding 1-D full Maxwell's equations finite-difference time-domain (FDTD) models.

  8. Low-temperature chemical vapor depostion of ruthenium and manganese nitride thin films

    NASA Astrophysics Data System (ADS)

    Lazarz, Teresa S.

    Materials and thin film processing development has been and remains key to continuing to make ever smaller, or miniaturized, microelectronic devices. In order to continue miniaturization, conformal, low-temperature deposition of new electronic materials is needed. Two techniques capable of conformality have emerged: chemical vapor deposition (CVD) and atomic layer deposition (ALD). Here, two processes for deposition of materials which could be useful in microelectronics, but for which no low-temperature, conformal process has been established as commercializable, are presented. One is ruthenium, intended for use in interconnects and in dynamic random access memory electrodes, a known material for use in microelectronics but for which a more conformal, yet fast process than previously demonstrated is required. The other is manganese nitride, which could be used as active magnetic layers in devices or as a dopant in materials for spintronics, which is not yet established as a desired material in part due to the lack of any previously known CVD or ALD process for deposition. A unique challenge arises in trying to grow impurity-free films of a catalyst. Ruthenium metal activates C-H and C-C bonds, which aids C-H and C-C bond scission. This creates a potential catalytic decomposition path for all metal-organic CVD precursors that is likely to lead to significant carbon incorporation. Metallic ruthenium films can be grown by chemical vapor deposition from the organometallic precursor tricarbonyl(1,3-cyclohexadiene)ruthenium(0). This precursor is a highly volatile liquid, easy to synthesize and handle, and capable of delivering at least 0.26 Torr partial pressure at room temperature without the use of a carrier gas. Because the precursor is a liquid, the vaporization rate is not subject to the problem of diminishing surface area that occurs with solid precursors. CVD proceeds readily for substrate temperatures ≥ 200°C. The growth rates are high, up to 24 nm/min, which

  9. Sequential lateral solidification of silicon thin films on low-k dielectrics for low temperature integration

    SciTech Connect

    Carta, Fabio Hlaing, Htay; Kymissis, Ioannis; Gates, Stephen M.; Edelstein, Daniel C.; Limanov, Alexander B.; Im, James S.

    2014-12-15

    We present the excimer laser crystallization of amorphous silicon on a low dielectric constant (low-k) insulator for very large scale integration monolithic 3D integration and demonstrate that low dielectric constant materials are suitable substrates for 3D integration through laser crystallization of silicon thin films. We crystallized 100 nm amorphous silicon on top of SiO{sub 2} and SiCOH (low-k) dielectrics, at different material thicknesses (1 μm, 0.75 μm, and 0.5 μm). The amorphous silicon crystallization on low-k dielectric requires 35% less laser energy than on an SiO{sub 2} dielectric. This difference is related to the thermal conductivity of the two materials, in agreement with one dimensional simulations of the crystallization process. We analyzed the morphology of the material through defect-enhanced microscopy, Raman spectroscopy, and X-ray diffraction analysis. SEM micrographs show that polycrystalline silicon is characterized by micron-long grains with an average width of 543 nm for the SiO{sub 2} sample and 570 nm for the low-k samples. Comparison of the Raman spectra does not show any major difference in film quality for the two different dielectrics, and polycrystalline silicon peaks are closely placed around 517 cm{sup −1}. From X-ray diffraction analysis, the material crystallized on SiO{sub 2} shows a preferential (111) crystal orientation. In the SiCOH case, the 111 peak strength decreases dramatically and samples do not show preferential crystal orientation. A 1D finite element method simulation of the crystallization process on a back end of line structure shows that copper (Cu) damascene interconnects reach a temperature of 70 °C or lower with a 0.5 μm dielectric layer between the Cu and the molten Si layer, a favorable condition for monolithic 3D integration.

  10. Structural Characterization of Atomically Thin Hexagonal Boron Nitride via Raman Spectroscopy

    DTIC Science & Technology

    2014-03-27

    count the number of h-BN/graphene layers synthesized , it is necessary to develop a methodology to measure h-BN thickness via Raman spectroscopy...common wurtzite structure having been achieved via laboratory fabrication [30]. Given that boron nitride is a purely synthesized material through the...regimented approach to fabrication has allowed the continued refinement to the purity and quality of synthesized boron nitride and has led recently to

  11. Low-voltage and hysteresis-free organic thin-film transistors employing solution-processed hybrid bilayer gate dielectrics

    SciTech Connect

    Ha, Tae-Jun

    2014-07-28

    This study presents a promising approach to realize low-voltage (<3 V) organic thin-film transistors (OTFTs) exhibiting improved electrical and optical stability. Such device performance results from the use of solution-processed hybrid bilayer gate dielectrics consisting of zirconium dioxide (high-k dielectric) and amorphous fluoropolymer, CYTOP{sup ®} (low-k dielectric). Employing a very thin amorphous fluoropolymer film reduces interfacial defect-states by repelling water molecules and other aqueous chemicals from an organic semiconductor active layer due to the hydrophobic surface-property. The chemically clean interface, stemming from decrease in density of trap states improves all the key device properties such as field-effect mobility, threshold voltage, and sub-threshold swing. Furthermore, degradation by electrical bias-stress and photo-induced hysteresis were suppressed in OTFTs employing hybrid bilayer gate dielectrics.

  12. Nanocomposites of polyimide and mixed oxide nanoparticles for high performance nanohybrid gate dielectrics in flexible thin film transistors

    NASA Astrophysics Data System (ADS)

    Kim, Ju Hyun; Hwang, Byeong-Ung; Kim, Do-Il; Kim, Jin Soo; Seol, Young Gug; Kim, Tae Woong; Lee, Nae-Eung

    2017-01-01

    Organic gate dielectrics in thin film transistors (TFTs) for flexible display have advantages of high flexibility yet have the disadvantage of low dielectric constant (low-k). To supplement low-k characteristics of organic gate dielectrics, an organic/inorganic nanocomposite insulator loaded with high-k inorganic oxide nanoparticles (NPs) has been investigated but high loading of high-k NPs in polymer matrix is essential. Herein, compositing of over-coated polyimide (PI) on self-assembled (SA) layer of mixed HfO2 and ZrO2 NPs as inorganic fillers was used to make dielectric constant higher and leakage characteristics lower. A flexible TFT with lower the threshold voltage and high current on/off ratio could be fabricated by using the hybrid gate dielectric structure of the nanocomposite with SA layer of mixed NPs on ultrathin atomic-layer deposited Al2O3.

  13. Thickness dependence of the dielectric properties of thermally evaporated Sb2Te3 thin films

    NASA Astrophysics Data System (ADS)

    Ulutas, K.; Deger, D.; Yakut, S.

    2013-03-01

    Sb2Te3 thin films of different thickness (23 - 350 nm) were prepared by thermal evaporation technique. The thickness dependence of the ac conductivity and dielectric properties of the Sb2Te3 films have been investigated in the frequency range 10 Hz- 100 kHz and within the temperature range 293-373K. Both the dielectric constant epsilon1 and dielectric loss factor epsilon2 were found to depend on frequency, temperature and film thickness. The frequency and temperature dependence of ac conductivity (σac(ω)) has also been determined. The ac conductivity of our samples satisfies the well known ac power law; i.e., σac(ω) propto ωs where s<1 and independent of the film thickness. The temperature dependence of ac conductivity and parameter s is reasonably well interpreted by the correlated barrier hopping (CBH) model. The activation energies were evaluated for various thicknesses. The temperature coefficient of the capacitance (TCC) and permitivity (TCP) were determined as a function of the film thickness. The microstructure of the samples were analyzed using X-ray diffraction (XRD). This results are discussed on the base of the differences in their morphologies and thicknesses. The tendency for amorphization of the crystalline phases becomes evident as the film thickness increases.

  14. Yttrium scandate thin film as alternative high-permittivity dielectric for germanium gate stack formation

    SciTech Connect

    Lu, Cimang Lee, Choong Hyun; Nishimura, Tomonori; Toriumi, Akira

    2015-08-17

    We investigated yttrium scandate (YScO{sub 3}) as an alternative high-permittivity (k) dielectric thin film for Ge gate stack formation. Significant enhancement of k-value is reported in YScO{sub 3} comparing to both of its binary compounds, Y{sub 2}O{sub 3} and Sc{sub 2}O{sub 3}, without any cost of interface properties. It suggests a feasible approach to a design of promising high-k dielectrics for Ge gate stack, namely, the formation of high-k ternary oxide out of two medium-k binary oxides. Aggressive scaling of equivalent oxide thickness (EOT) with promising interface properties is presented by using YScO{sub 3} as high-k dielectric and yttrium-doped GeO{sub 2} (Y-GeO{sub 2}) as interfacial layer, for a demonstration of high-k gate stack on Ge. In addition, we demonstrate Ge n-MOSFET performance showing the peak electron mobility over 1000 cm{sup 2}/V s in sub-nm EOT region by YScO{sub 3}/Y-GeO{sub 2}/Ge gate stack.

  15. Tb2O3 thin films: An alternative candidate for high-k dielectric applications

    NASA Astrophysics Data System (ADS)

    Gray, Nathan W.; Prestgard, Megan C.; Tiwari, Ashutosh

    2014-12-01

    We are reporting the growth and structural, optical, and dielectric properties of Tb2O3, a relatively unexplored high-k dielectric material. A pulsed-laser deposition technique was used to grow Tb2O3 thin-films on four different substrates: Si(100), SrTiO3(100), LaAlO3(100), and MgO(100). High-resolution X-ray diffraction and transmission electron microscopy results confirmed that film growth in an oxygen-rich (10-1 Torr) environment yields nearly single-crystal C-phase films, while a low-oxygen (10-6 Torr) environment growth results in the formation of monoclinic polycrystalline B-phase films. Optical transmission measurements showed that the bandgap of Tb2O3 is direct in nature with a value of 2.8 eV and 3.4 eV for the cubic and monoclinic phases, respectively. By measuring the capacitance of test devices, quite high dielectric constants of 13.5 and 24.9 were obtained for the B- and C-phase Tb2O3 films, respectively.

  16. Thickness dependent electronic structure and morphology of rubrene thin films on metal, semiconductor, and dielectric substrates

    NASA Astrophysics Data System (ADS)

    Sinha, Sumona; Mukherjee, M.

    2013-08-01

    The evolution of the electronic structure and morphology of rubrene thin films on noble-metal, semiconductor and dielectric substrates have been investigated as a function of thickness of deposited films by using photoelectron spectroscopy and atomic force microscopy. The clean polycrystalline Au and Ag were used as noble-metals, whereas, H passivated and SiO2 coated Si (100) were used as semiconductors and dielectric substrates. Discussion and comparison on interface dipole, energy level alignment, and surface morphology for the four cases are presented. The formation of dipole at metallic interfaces is found to occur due to push back effect. S parameter obtained from the variation of barrier height with the change of work function of the contacting metal indicates moderately weak interaction between rubrene and the metal substrates. The thickness dependent energy level alignment of the physisorbed rubrene films on different substrates is explained by a dielectric model in terms of electrostatic screening of photo-holes or photoemission final state relaxation energy. Films on all the substrates are found to grow following Stranski-Krastnov type growth mode and are more ordered at higher coverage.

  17. Optimal structure of light trapping in thin-film solar cells: dielectric nanoparticles or multilayer antireflection coatings?

    PubMed

    Zhao, Yongxiang; Chen, Fei; Shen, Qiang; Zhang, Lianmeng

    2014-08-10

    Recent research has found an alternative way to enhance light trapping of thin-film solar cells by using dielectric nanoparticles deposited on the cell surface. To improve the performance of light trapping, a systematic study on the influence of dielectric nanoparticles on enhancement efficiency is performed in this paper. We prove that the optimal dielectric nanoparticles are substantially equivalent to the multilayer antireflection coatings (ARCs) with a "low-high-low" dielectric constant profile. Moreover, it is demonstrated that the use of a simple two-layer SiO2/SiC ARC can reach 34.15% enhancement, which has exceeded the ideal limit of 32% of nanoparticles structure including plasmonic Ag nanoparticles, dielectric SiC, and TiO2 nanoparticles. That means the optimal multilayer ARCs structure is obviously superior to the optimal dielectric nanoparticles structure, and the deposition of a simple two-layer SiO2/SiC structure on top of a thin-film silicon solar cell can significantly enhance photoelectron generation and hence, result in superior performance of thin-film solar cells.

  18. Visible and near infrared emitting thin film electroluminescent gallium nitride doped with rare earths

    NASA Astrophysics Data System (ADS)

    Kim, Joo Han

    Visible and near-infrared (NIR) light-emitting thin-film electroluminescent gallium nitride (GaN) doped with rare earth (RE) elements was studied. The rare-earth-doped GaN thin films were prepared by radio frequency (RF) planar magnetron co-sputtering of separate targets consisting of a GaN compound target and a metallic rare earth target in a pure nitrogen atmosphere. The luminescence of rare-earth-doped GaN was shown to be a strong function of its structure and properties, and growth parameters affected the structure and properties of the GaN host films. A phase transition from the thermodynamically stable wurtzite to the metastable zinc-blende structure at room temperature in GaN host films was observed upon increasing the impact energy of the bombarding species, thereby increasing the compressive stress in the GaN film. The switch from wurtzite to zinc-blende GaN occurred at a compressive internal stress of ˜1 GPa. The internal compressive stress above this threshold value apparently stabilizes the zinc-blende GaN phase at room temperature. Field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM) showed that the impact by hyperthermal species yielded a highly condensed fibrous GaN microstructure with a smooth surface morphology due to annihilation of porosity by knock-on and bombardment-induced adatom mobility. X-ray diffraction and texture analyses showed that the GaN films deposited at a low pressure had a predominant cubic phase with a preferred crystallographic orientation of the [111] direction perpendicular to the surface of the film. X-ray rocking curve data revealed that cubic GaN films grown with a lower growth rate exhibited a more highly [111]-textured structure. Alternating-current thin-film electroluminescent (ACTFEL) devices were fabricated based on GaN doped with rare earth (RE) elements. Visible electroluminescent light emission peaks at 475 (blue), 530 (green), and 614 nm (red) were demonstrated at room temperature

  19. Dielectric relaxation and polaronic conduction in epitaxial BaFe12O19 hexaferrite thin film

    NASA Astrophysics Data System (ADS)

    Tang, Rujun; Zhou, Hao; Zhao, Run; Jian, Jie; Wang, Han; Huang, Jijie; Fan, Meng; Zhang, Wei; Wang, Haiyan; Yang, Hao

    2016-03-01

    The dielectric properties of epitaxial BaFe12O19 hexaferrite thin film have been investigated as a function of frequency (50 Hz  -  2 MHz) and temperature (100-375 K). The frequency dependent permittivity, impedance ({{Z}\\prime \\prime} ) and modulus ({{M}\\prime \\prime} ) spectra show that the dielectric responses of BaFe12O19 thin film are thermally activated. The activation energy of BaFe12O19 film (E a) is much smaller than that of the polycrystalline bulk BaFe12O19. In addition, E a increases with increasing temperature and there is a distribution of relaxation time in the sample. The scaling behavior of {{Z}\\prime \\prime} and {{M}\\prime \\prime} spectra of the sample further suggest that the distribution of relaxation time is temperature independent at low temperatures (<250 K) and temperature dependent at high temperatures. The temperature dependent dc conductivity shows that small polaron hopping is the most probable conduction mechanism for BaFe12O19 film.

  20. Solution-processed high-k magnesium oxide dielectrics for low-voltage oxide thin-film transistors

    NASA Astrophysics Data System (ADS)

    Jiang, Guixia; Liu, Ao; Liu, Guoxia; Zhu, Chundan; Meng, You; Shin, Byoungchul; Fortunato, Elvira; Martins, Rodrigo; Shan, Fukai

    2016-10-01

    Solution-processed metal-oxide thin films with high dielectric constants (k) have been extensively studied for low-cost and high-performance thin-film transistors (TFTs). In this report, MgO dielectric films were fabricated using the spin-coating method. The MgO dielectric films annealed at various temperatures (300, 400, 500, and 600 °C) were characterized by using thermogravimetric analysis, optical spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy, and atomic-force microscopy. The electrical measurements indicate that the insulating properties of MgO thin films are improved with an increase in annealing temperature. In order to clarify the potential application of MgO thin films as gate dielectrics in TFTs, solution-derived In2O3 channel layers were separately fabricated on various MgO dielectric layers. The optimized In2O3/MgO TFT exhibited an electron mobility of 5.48 cm2/V s, an on/off current ratio of 107, and a subthreshold swing of 0.33 V/dec at a low operation voltage of 6 V. This work represents a great step toward the development of portable and low-power consumption electronics.

  1. Surface/interface analysis and optical properties of RF sputter-deposited nanocrystalline titanium nitride thin films

    NASA Astrophysics Data System (ADS)

    White, N.; Campbell, A. L.; Grant, J. T.; Pachter, R.; Eyink, K.; Jakubiak, R.; Martinez, G.; Ramana, C. V.

    2014-02-01

    Titanium nitride (TiNx) thin films were grown by radio-frequency (RF) magnetron sputter deposition by varying the nitrogen content in the reactive gas mixture over a wide range. The effect of nitrogen gas flow rate on the surface and interface morphology, chemical composition and optical properties of TiN thin films was studied employing atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and spectroscopic ellipsometry (SE). Analysis of the optical properties probed with SE has shown that films deposited at low (0-5 sccm) nitrogen flow rates have the highest absorption at energies <2 eV. It was also shown that Lorentz oscillators with energy positions lower than 2 eV can be distinguished from the Drude oscillator function during parameter fitting. AFM imaging analysis indicates that the roughness decreases and plateaus at approximately 1.5 nm with the introduction of a small N2 flow rate, remaining consistent thereafter. SEM cross-sectional imaging analysis indicates the dense, columnar structure for the films grown at lower nitrogen flow rates. XPS analysis of atomic composition and the chemical states indicate that the atomic composition remained nearly constant while the chemical states varied significantly among the samples as a function of N2 flow rate. XPS analyses confirm the presence of TiNx, TiO2 and TiOxNy. These process-property relationships derived could be useful for defining and expanding the range of optical and electronic applications of titanium nitrides and (oxy)nitrides.

  2. Spreading of Thin Droplets of Perfect and Leaky Dielectric Liquids on Inclined Surfaces.

    PubMed

    Corbett, Andrew; Kumar, Satish

    2016-07-05

    The spreading of droplets may be influenced by electric fields, a situation that is relevant to applications such as coating, printing, and microfluidics. In this work we study the effects of an electric field on the gravity-driven spreading of two-dimensional droplets down an inclined plane. We consider both perfect and leaky dielectric liquids, as well as perfectly and partially wetting systems. In addition to the effects of electric fields, we examine the use of thermocapillary forces to suppress the growth of the capillary ridge near the droplet front. Lubrication theory is applied to generate a set of coupled partial differential equations for interfacial height and charge, which are then solved numerically with a finite-difference method. Electric fields increase the height of the capillary ridge in both perfect and leaky dielectric droplets due to electrostatic pressure gradients that drive liquid into the ridge. In leaky dielectrics, large interfacial charge gradients in the contact-line region create shear stresses that also enhance ridge growth and the formation of trailing minor ridges. The coalescence of these ridges can significantly affect the long-time thinning rate of leaky dielectric droplets. In partially wetting liquids, electric fields promote the splitting of smaller droplets from the primary droplet near the receding contact line due to the interplay between electrostatic forces and disjoining pressure. Cooling from below and heating from above generates thermocapillary forces that counteract the effects of electric fields and suppress the growth of the capillary ridge. The results of this work have important implications for manipulating the spreading of droplets down inclined surfaces.

  3. Three-dimensional kinetic Monte Carlo simulations of cubic transition metal nitride thin film growth

    NASA Astrophysics Data System (ADS)

    Nita, F.; Mastail, C.; Abadias, G.

    2016-02-01

    A three-dimensional kinetic Monte Carlo (KMC) model has been developed and used to simulate the microstructure and growth morphology of cubic transition metal nitride (TMN) thin films deposited by reactive magnetron sputtering. Results are presented for the case of stoichiometric TiN, chosen as a representative TMN prototype. The model is based on a NaCl-type rigid lattice and includes deposition and diffusion events for both N and Ti species. It is capable of reproducing voids and overhangs, as well as surface faceting. Simulations were carried out assuming a uniform flux of incoming particles approaching the surface at normal incidence. The ballistic deposition model is parametrized with an interaction parameter r0 that mimics the capture distance at which incoming particles may stick on the surface, equivalently to a surface trapping mechanism. Two diffusion models are implemented, based on the different ways to compute the site-dependent activation energy for hopping atoms. The influence of temperature (300-500 K), deposition flux (0.1-100 monolayers/s), and interaction parameter r0 (1.5-6.0 Å) on the obtained growth morphology are presented. Microstructures ranging from highly porous, [001]-oriented straight columns with smooth top surface to rough columns emerging with different crystallographic facets are reproduced, depending on kinetic restrictions, deposited energy (seemingly captured by r0), and shadowing effect. The development of facets is a direct consequence of the diffusion model which includes an intrinsic (minimum energy-based) diffusion anisotropy, although no crystallographic diffusion anisotropy was explicitly taken into account at this stage. The time-dependent morphological evolution is analyzed quantitatively to extract the growth exponent β and roughness exponent α , as indicators of kinetic roughening behavior. For dense TiN films, values of α ≈0.7 and β =0.24 are obtained in good agreement with existing experimental data. At this

  4. Propagation of surface waves and waveguide modes guided by a dielectric slab inserted in a sculptured nematic thin film

    SciTech Connect

    Faryad, Muhammad; Lakhtakia, Akhlesh

    2011-01-15

    Wave propagation guided by a dielectric slab inserted in a sculptured nematic thin film (SNTF) was studied theoretically. Two types of guided waves can be identified: (i) surface (Dyakonov-Tamm) waves guided by one or both of the two planar interfaces of the dielectric slab and the SNTF, and (ii) waveguide modes in the dielectric waveguide formed by the slab with the SNTF as the cladding. As the thickness of the dielectric slab is increased, the number of waveguide modes increases. If the slab thickness is less than twice the e-folding distance into the dielectric slab, the Dyakonov-Tamm waves propagate coupled to both interfaces; the coupling decreases and eventually vanishes as the slab thickness increases, so that Dyakonov-Tamm waves are guided by the individual dielectric-SNTF interfaces independently. The chosen structure supports the propagation of Dyakonov-Tamm waves in all directions, in contrast to the restricted range of propagation supported by a single SNTF-dielectric interface. Propagation of both Dyakonov-Tamm waves and waveguide modes should occur in practice with negligible attenuation, in contrast to that of surface-plasmon-polariton waves that are guided when the dielectric slab is replaced by a metal slab.

  5. Propagation of surface waves and waveguide modes guided by a dielectric slab inserted in a sculptured nematic thin film

    NASA Astrophysics Data System (ADS)

    Faryad, Muhammad; Lakhtakia, Akhlesh

    2011-01-01

    Wave propagation guided by a dielectric slab inserted in a sculptured nematic thin film (SNTF) was studied theoretically. Two types of guided waves can be identified: (i) surface (Dyakonov-Tamm) waves guided by one or both of the two planar interfaces of the dielectric slab and the SNTF, and (ii) waveguide modes in the dielectric waveguide formed by the slab with the SNTF as the cladding. As the thickness of the dielectric slab is increased, the number of waveguide modes increases. If the slab thickness is less than twice the e-folding distance into the dielectric slab, the Dyakonov-Tamm waves propagate coupled to both interfaces; the coupling decreases and eventually vanishes as the slab thickness increases, so that Dyakonov-Tamm waves are guided by the individual dielectric-SNTF interfaces independently. The chosen structure supports the propagation of Dyakonov-Tamm waves in all directions, in contrast to the restricted range of propagation supported by a single SNTF-dielectric interface. Propagation of both Dyakonov-Tamm waves and waveguide modes should occur in practice with negligible attenuation, in contrast to that of surface-plasmon-polariton waves that are guided when the dielectric slab is replaced by a metal slab.

  6. Nonlinear dielectric thin films for high-power electric storage with energy density comparable with electrochemical supercapacitors.

    PubMed

    Yao, Kui; Chen, Shuting; Rahimabady, Mojtaba; Mirshekarloo, Meysam Sharifzadeh; Yu, Shuhui; Tay, Francis Eng Hock; Sritharan, Thirumany; Lu, Li

    2011-09-01

    Although batteries possess high energy storage density, their output power is limited by the slow movement of charge carriers, and thus capacitors are often required to deliver high power output. Dielectric capacitors have high power density with fast discharge rate, but their energy density is typically much lower than electrochemical supercapacitors. Increasing the energy density of dielectric materials is highly desired to extend their applications in many emerging power system applications. In this paper, we review the mechanisms and major characteristics of electric energy storage with electrochemical supercapacitors and dielectric capacitors. Three types of in-house-produced ferroic nonlinear dielectric thin film materials with high energy density are described, including (Pb(0.97)La(0.02))(Zr(0.90)Sn(0.05)Ti(0.05))O(3) (PLZST) antiferroelectric ceramic thin films, Pb(Zn(1/3)Nb(2/3))O(3-)Pb(Mg(1/3)Nb(2/3))O(3-)PbTiO(3) (PZN-PMN-PT) relaxor ferroelectric ceramic thin films, and poly(vinylidene fluoride) (PVDF)-based polymer blend thin films. The results showed that these thin film materials are promising for electric storage with outstandingly high power density and fairly high energy density, comparable with electrochemical supercapacitors.

  7. Epitaxy of highly ordered organic semiconductor crystallite networks supported by hexagonal boron nitride

    PubMed Central

    Matković, Aleksandar; Genser, Jakob; Lüftner, Daniel; Kratzer, Markus; Gajić, Radoš; Puschnig, Peter; Teichert, Christian

    2016-01-01

    This study focuses on hexagonal boron nitride as an ultra-thin van der Waals dielectric substrate for the epitaxial growth of highly ordered crystalline networks of the organic semiconductor parahexaphenyl. Atomic force microscopy based morphology analysis combined with density functional theory simulations reveal their epitaxial relation. As a consequence, needle-like crystallites of parahexaphenyl grow with their long axes oriented five degrees off the hexagonal boron nitride zigzag directions. In addition, by tuning the deposition temperature and the thickness of hexagonal boron nitride, ordered networks of needle-like crystallites as long as several tens of micrometers can be obtained. A deeper understanding of the organic crystallites growth and ordering at ultra-thin van der Waals dielectric substrates will lead to grain boundary-free organic field effect devices, limited only by the intrinsic properties of the organic semiconductors. PMID:27929042

  8. Proof of damage-free selective removal of thin dielectric coatings on silicon wafers by irradiation with femtosecond laser pulses

    SciTech Connect

    Rublack, Tino; Muchow, Markus; Schade, Martin; Leipner, Hartmut S.; Seifert, Gerhard

    2012-07-15

    The microstructural impact of selective femtosecond laser ablation of thin dielectric layers from monocrystalline silicon wafers was investigated. Various spots opened by 280 fs laser pulses at {lambda} = 1.03 {mu}m wavelength and 50 fs pulses at 800 nm, respectively, were analyzed in detail using Raman and transmission electron microscopy. The results show clearly that the thin dielectric films can be removed without any detectable modification of the Si crystal structure in the opened area. In contrast, in adjacent regions corresponding to laser fluence slightly below the breaking threshold, a thin layer of amorphous silicon with a maximum thickness of about 50 nm is found at the Si/SiO{sub 2} interface after laser irradiation. More than one pulse on the same position, however, causes structural modification of the silicon after thin film ablation in any case.

  9. Interfacial effects in oxide-polymer laminar composite thin film dielectrics for capacitor applications

    NASA Astrophysics Data System (ADS)

    Tewari, Pratyush

    Continuous increase in the density of active components on microelectronic chip/circuit board requires development of new capacitors with smaller size, weight and cost. Miniaturization in the size of capacitors demands development of high energy density dielectric materials, which are the core of parallel plate capacitors. Nano composite dielectrics comprising high polarizibility oxide fillers randomly dispersed in high breakdown strength polymer matrix are considered as a potential high energy density materials for capacitor applications. Large interfacial volume, generated due to introduction of nano fillers in polymer matrix, might have significant positive contribution towards energy storage in nano composites. However, percolation issues associated with nano fillers and generation of large interfacial volume in nano composites, where complex electric field distribution overlaps with interfacialy modified polymer lead to unclear understanding of polymer-filler interfacial interactions in nano composites. Hence, in the current work laminar composite double layered dielectric structures, which provide relatively simple local field distribution at the interface and ideal series connectivity between oxide and polymer, are used as a model system to understand polymer-oxide interfacial interactions. Interfacial effects are reported for both low permittivity (SiO2-Parylene C) and medium permittivity (ZrO2-P(VDF-TrFE)) laminar composite dielectrics. Pyrolytic vapor decomposition polymerization process was used to grow Parylene C thin films on gold and thermally grown SiO2 surfaces. Enhancement in crystallite dimension with post deposition annealing treatments of Parylene C thin films was found to reduce dielectric loss tangent and hence enhance its dielectric properties. Electric field and temperature dependant leakage current analysis suggested hopping as dominant conduction mechanism in Parylene C thin films. Parylene C thin films in laminar composites showed

  10. Deposition and characterization of titanium dioxide and hafnium dioxide thin films for high dielectric applications

    NASA Astrophysics Data System (ADS)

    Yoon, Meeyoung

    The industry's demand for higher integrated circuit density and performance has forced the gate dielectric layer thickness to decrease rapidly. The use of conventional SiO2 films as gate oxide is reaching its limit due to the rapid increase in tunneling current. Therefore, a need for a high dielectric material to produce large oxide capacitance and low leakage current has emerged. Metal-oxides such as titanium dioxide (TiO2) and hafnium dioxide (HfO2) are attractive candidates for gate dielectrics due to their electrical and physical properties suitable for high dielectric applications. MOCVD of TiO2 using titanium isopropoxide (TTIP) precursor on p-type Si(100) has been studied. Insertion of a TiO x buffer layer, formed by depositing metallic Ti followed by oxidation, at the TiO2/Si interface has reduced the carbon contamination in the TiO2 film. Elemental Ti films, analyzed by in-situ AES, were found to grow according to Stranski-Krastanov mode on Si(100). Carbon-free, stoichiometric TiO2 films were successfully produced on Si(100) without any parasitic SiO2 layers at the TiO 2/Si interface. Electron-beam deposition of HfO2 films on Si(100) has also been investigated in this work. HfO2 films are formed by depositing elemental Hf on Si(100) and then oxidizing it either in O2 or O 3. XPS results reveal that with oxidation Hf(4f) peak shifts +3.45eV with 02 and +3.65eV with O3 oxidation. LEED and AFM studies show that the initially ordered crystalline Hf becomes disordered after oxidation. The thermodynamic stability of HfO2 films on Si has been studied using a unique test-bed structure of Hf/O3/Si. Post-Oxidation of Layer Deposition (POLD) has been employed to produce HfO2 films with a desired thickness. XPS results indicate that stoichiometric HfO 2 films were successfully produced using the POLD process. The investigation of the growth and thin film properties of TiO 2 and HfO2 using oxygen and ozone has laid a foundation for the application of these metal

  11. Terahertz dielectric response of ferroelectric Ba(x)Sr(1-x)TiO3 thin films.

    PubMed

    Kang, Seung Beom; Kwak, Min Hwan; Choi, Muhan; Kim, Sungil; Kim, Taeyong; Cha, Eun Jong; Kang, Kwang Yong

    2011-11-01

    Terahertz time-domain spectroscopy has been used to investigate the dielectric and optical properties of ferroelectric Ba(x)Sr(1-x)TiO(3) thin films for nominal x-values of 0.4, 0.6, and 0.8 in the frequency range of 0.3 to 2.5 THz. The ferroelectric thin films were deposited at approximately 700 nm thickness on [001] MgO substrate by pulsed laser deposition. The measured complex dielectric and optical constants were compared with the Cole-Cole relaxation model. The results show that the Cole-Cole relaxation model fits well with the data throughout the frequency range and the dielectric relaxation behavior of ferroelectric Ba(x)Sr(1-x)TiO(3) thin films varies with the films compositions. Among the compositions of Ba(x)Sr(1-x)TiO(3) films with different Ba/Sr ratios, Ba(0.6)Sr(0.4)TiO(3) has the highest dielectric constants and the shortest dielectric relaxation time.

  12. Effect of high-power laser radiation on characteristics of thin silicon nitride films

    SciTech Connect

    Roizin, Y.O.; Khuan, K.S.

    1986-09-01

    High-power laser radiation is used in microelectronic technology for purposes such as annealing radiation defects in MOS structures after ion implantation. This paper considers accumulated changes in electrical characteristics of metal-nitride-oxide-semiconductor (MNOS) structures under the action of neodymium laser pulses with an energy density below the visible damage threshold. The experimental results obtained are interpreted.

  13. Research on Nitride Thin Films, Advanced Plasma Diagnostics, and Charged-Particle Processes

    DTIC Science & Technology

    2006-07-01

    Area Code) N/A Standard Form 298 (Rev. 8-98) Prescribed by ANSI Std. Z39-18 iii Table of Contents Section Page TASK 1. CARBON-NITRIDE...5.11 Optical Band Gap . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 52 iv Table of Contents...65 44 Values of εr for Each Sample Condition and Substrate Type . . . . . . . . . . . . . . . . 67 viii List of Tables Table

  14. Group III-nitride thin films grown using MBE and bismuth

    DOEpatents

    Kisielowski, Christian K.; Rubin, Michael

    2000-01-01

    The present invention comprises growing gallium nitride films in the presence of bismuth using MBE at temperatures of about 1000 K or less. The present invention further comprises the gallium nitride films fabricated using the inventive fabrication method. The inventive films may be doped with magnesium or other dopants. The gallium nitride films were grown on sapphire substrates using a hollow anode Constricted Glow Discharge nitrogen plasma source. When bismuth was used as a surfactant, two-dimensional gallium nitride crystal sizes ranging between 10 .mu.m and 20 .mu.m were observed. This is 20 to 40 times larger than crystal sizes observed when GaN films were grown under similar circumstances but without bismuth. It is thought that the observed increase in crystal size is due bismuth inducing an increased surface diffusion coefficient for gallium. The calculated value of 4.7.times.10.sup.-7 cm.sup.2 /sec. reveals a virtual substrate temperature of 1258 K which is 260 degrees higher than the actual one.

  15. Group III-nitride thin films grown using MBE and bismuth

    DOEpatents

    Kisielowski, Christian K.; Rubin, Michael

    2002-01-01

    The present invention comprises growing gallium nitride films in the presence of bismuth using MBE at temperatures of about 1000 K or less. The present invention further comprises the gallium nitride films fabricated using the inventive fabrication method. The inventive films may be doped with magnesium or other dopants. The gallium nitride films were grown on sapphire substrates using a hollow anode Constricted Glow Discharge nitrogen plasma source. When bismuth was used as a surfactant, two-dimensional gallium nitride crystal sizes ranging between 10 .mu.m and 20 .mu.m were observed. This is 20 to 40 times larger than crystal sizes observed when GaN films were grown under similar circumstances but without bismuth. It is thought that the observed increase in crystal size is due bismuth inducing an increased surface diffusion coefficient for gallium. The calculated value of 4.7.times.10.sup.-7 cm.sup.2 /sec. reveals a virtual substrate temperature of 1258 K which is 260 degrees higher than the actual one.

  16. Tantalum oxide thin films for high-k dielectric applications: Crystallization, anisotropy and three dimensional imaging

    NASA Astrophysics Data System (ADS)

    Min, Kyunghoon

    2004-12-01

    High dielectric constant (high-k) materials have been drawing much attention for applications such as gate oxides for transistors and dynamic random access memory (DRAM) capacitors. Tantalum pentoxide (Ta2O5) is a possible replacement because of its relatively high dielectric constant and process compatibility. The microstructure of Ta2O5 thin films, deposited on Si substrates by atomic layer deposition, was investigated primarily using transmission electron microscopy (TEM). The kinetics of the crystallization and evolution of a complicated subgrain structure were studied by in-situ TEM heating experiments carried out at nominal temperatures of 790°C, 820°C and 850°C. It was found that the crystallization behavior could be modeled by a standard kinetic approach, using the Avrami equation, and differences from conventional bulk behavior are discussed. The growth and overall crystallization activation energies extracted from the in-situ TEM results were 4.2 eV and 6.3 eV, respectively. The tantalum oxide films used in this study were found to have two predominant crystallographic orientations. In order to evaluate the possible anisotropic properties of the two types of grains, micro-capacitors were fabricated on each type using a combination of a focused ion beam machine (FIB) and the TEM. Plan-view TEM samples were prepared to identify and locate grain orientations followed by electron beam assisted chemical vapor deposition of a Pt top electrode using the local deposition capability of the FIB. Electrical measurement of the micro-capacitors was carried out using a micromanipulator inside the FIB. The dielectric properties of the two types of grains were directly compared from the measurements. A further application of FIB combined with TEM allows novel specimen preparation for electron tomography. Accordingly, we can address the three dimensional imaging of Ta2O5 thin films deposited on hemi-spherical grain silicon (HSG) structures. The post-shaped sample

  17. Radiation and Internal Charging Environments for Thin Dielectrics in Interplanetary Space

    NASA Technical Reports Server (NTRS)

    Minow, Joseph I.; Parker, Linda Neergaard; Altstatt, Richard L.

    2004-01-01

    Spacecraft designs using solar sails for propulsion or thin membranes to shade instruments from the sun to achieve cryogenic operating temperatures are being considered for a number of missions in the next decades. A common feature of these designs are thin dielectric materials that will be exposed to the solar wind, solar energetic particle events, and the distant magnetotail plasma environments encountered by spacecraft in orbit about the Earth-Sun L2 point. This paper will discuss the relevant radiation and internal charging environments developed to support spacecraft design for both total dose radiation effects as well as dose rate dependent phenomenon, such as internal charging in the solar wind and distant magnetotail environments. We will describe the development of radiation and internal charging environment models based on nearly a complete solar cycle of Ulysses solar wind plasma measurements over a complete range of heliocentric latitudes and the early years of the Geotail mission where distant magnetotail plasma environments were sampled beyond X(sub GSE) = -100 Re to nearly L2 (X(sub GSE) -236 Re). Example applications of the environment models are shown to demonstrate the radiation and internal charging environments of thin materials exposed to the interplanetary space plasma environments.

  18. Temperature dependent dielectric and ferroelectric studies of BiFeO3 thin film

    NASA Astrophysics Data System (ADS)

    Gaur, Anand P. S.; Barik, Sujit K.; Katiyar, Ram S.

    2013-03-01

    Although BiFeO3 (BFO) has received a lot of interest due to its good multiferroic properties at room temperature, high leakage current limit its usage for practical applications. Recently, it is found that these properties in thin films can be different due to strain effect induced by substrate, preparation conditions and electrode effects, etc. In this context, we have studied the temperature dependence of polarization and dielectric properties of BFO thin film by varying the bottom electrode thickness and using different electrodes. The strain dependent ferroelectric switching behaviors have also been investigated with a traditional ferroelectric tester and switching spectroscopy piezoresponse force microscopy (SS-PFM), respectively. We used pulsed laser deposition to fabricate thin films of BFO using Si (100) substrate and SrTiO3(STO) as buffer layer with different bottom electrodes such as SrRuO3(SRO), LaNiO3(LNO) and Pt/Si. The thickness of STO layer is kept fixed around 70 nm and the thicknesses of BFO and electrode layer were varied from 70 nm to 200nm. The layers were grown under optimized conditions and polycrystalline nature is found from room temperature XRD. A large enhancement of polarization is found while using LNO electrode and also with reducing the thickness of BFO layer. The remnant polarization and cohesivity also shows large increase with increaisng temperature, although leakage current increases significantly. NSF

  19. Controlling the optical scattering of plasmonic nanoparticles using a thin dielectric layer

    NASA Astrophysics Data System (ADS)

    Powell, A. W.; Wincott, M. B.; Watt, A. A. R.; Assender, H. E.; Smith, J. M.

    2013-05-01

    The effect of a thin dielectric film on the plasmonic behaviour of metal nanoparticles (MNPs) above a high refractive index substrate is explored. Using finite-difference time domain simulations, the optical properties of Ag nanoparticles are investigated as a function of film thickness, refractive index, and particle position within the film. We demonstrate that the addition of a film around a MNP at the air interface of a high-index substrate, where nairthin-film solar cells. We show that the inclusion of a thin film can increase the fraction of radiation coupled into the substrate by up to 30% for solar wavelengths. Additional potential benefits of the film structure, such as greater tunability of scattering resonances, an increase in path length of light in the substrate, and some control over the emission pattern are demonstrated. MNPs in a film are found to produce a more finely structured emission pattern than particles at a simple interface, showing potential for this research to be applied to optical nanoantennae.

  20. Electrical properties of nanoscale metallic thin films on dielectric elastomer at various strain rates

    NASA Astrophysics Data System (ADS)

    Faisal, Md. Shahnewaz Sabit; Ye, Zhihang; Chen, Zheng; Asmatulu, Ramazan

    2015-04-01

    Dielectric elastomers (DEs) have significant applications in artificial muscle and other biomedical equipment and device fabrications. Metallic thin films by thin film transfer and sputter coating techniques can provide conductive surfaces on the DE samples, and can be used as electrodes for the actuators and other biomedical sensing devices. In the present study, 3M VHB 4910 tape was used as a DE for the coating and electrical characterization tests. A 150 nm thickness of gold was coated on the DE surfaces by sputter coating under vacuum with different pre-strains, ranging from 0 to 100%. Some of the thin films were transferred to the surface of the DEs. Sputter coating, and direct transferring gold leaf coating methods were studied and the results were analyzed in detail in terms of the strain rates and electrical resistivity changes. Initial studies indicated that the metallic surfaces remain conductive even though the DE films were considerably elongated. The coated DEs can be used as artificial muscle by applying electrical stimulation through the conductive surfaces. This study may provide great benefits to the readers, researchers, as well as companies involved in manufacturing of artificial muscles and actuators using smart materials.

  1. Cross-linking effect on dielectric properties of polypropylene thin films and applications in electric energy storage

    NASA Astrophysics Data System (ADS)

    Yuan, Xuepei; Chung, T. C. Mike

    2011-02-01

    A family of cross-linked polypropylene (x-PP) thin film dielectrics is systematically studied to understand the cross-linking effect on the dielectric properties. Evidently, the butylstyrene (BSt) cross-linkers increase both the dielectric constant (ɛ) and breakdown strength (E), without increasing energy loss. An x-PP dielectric, with 3.65 mol % BSt cross-linkers, exhibits a ɛ ˜3, which is independent of a wide range of temperatures and frequencies, slim D-E hysteresis loops, high breakdown strength (E=650 MV/m), narrow breakdown distribution, and reliable energy storage capacity >5 J/cm3 (double that of state-of-the-art biaxially oriented polypropylene capacitors), without showing any increase in energy loss.

  2. Shift and elimination of microwave Fabry-Perot resonances in a dielectric covered with a thin metal layer

    NASA Astrophysics Data System (ADS)

    Ragulis, Paulius; Simniškis, Rimantas; Kancleris, Žilvinas

    2015-04-01

    In this paper, we consider a plane electromagnetic wave incident onto a dielectric plate, which has one surface covered with a thin layer of metal. An oblique incident angle was considered for the TE (s polarization in optic) and TM (p polarization) plane waves. The thin metal layer is treated as an infinitesimal thickness. It was characterized by a surface conductivity and accounted for by a tangential magnetic field component step induced by the current flow in the metal layer. Compact expressions, which describe the reflection, transmission and absorption in a dielectric plate covered with a thin layer of metal, have been obtained. It was shown that by choosing the appropriate surface conductivity, the Fabry-Perot transmission resonances can be shifted to the position where the maximum reflection is observed in the case of an uncovered dielectric. On the other hand, the elimination of the Fabry-Perot resonances can be also achieved by choosing a proper metal surface conductivity. Measurements of the reflection from the glass covered with a thin layer of metal have been performed in a wide microwave frequency range (2-12 GHz) revealing a large difference in the measured reflection coefficient from the dielectric and metalized surfaces. The measured results fit well with those calculated by employing analytical expressions obtained in this paper.

  3. Temperature dependence of the dielectric function of laser deposited YBCO thin film at 3392nm

    SciTech Connect

    Walmsley, D.G.; Bade, T.; McCafferty, P.G.; Rea, C.; Dawson, P.; Wallace, R.J.; Bowman, R.M.

    1996-12-31

    The authors have excited surface plasmons in an YBCO thin film at different temperatures using attenuated total reflection of light. The 300nm thick c-axis film was fabricated using pulsed laser deposition onto an MgO (100) substrate with 248nm KrF excimer radiation. Critical temperature of the film was 89.6K and its roughness, as shown by atomic force microscopy, 20nm rms, without droplets over areas of 10 {micro}m x 10{micro}m. The sample was mounted in Otto geometry on a cooled stage which allowed the temperature to be varied between 300K and 70K. An infrared HeNe laser at 3,392nm was used to excite the surface plasmons. The dielectric function of the film was determined between room temperature and 80K. The imaginary part of the dielectric function decreased substantially with reduction in temperature. Results obtained were: {var_epsilon}{sub r} = {minus}24.1 + 0.0013T and {var_epsilon}{sub i} = 7.7 + 0.067T where T is the temperature in kelvin. The ratio {var_epsilon}{sub i}{sup 300}/{var_epsilon}{sub i}{sup 80} at 2.13 is less than the resistance ratio R{sup 300}/R{sup 80} at 2.81. An explanation is offered in terms of two temperature independent mechanisms operative at optical frequencies: enhanced Rayleigh scattering of surface plasmons at grain boundaries and intraband/interband transitions. The real part of the dielectric function, {var_epsilon}{sub r}, was found to be only slightly temperature dependent. It was, however, highly sample dependent when comparison was made with the results of other films, a feature attributed to surface and grain boundary contamination.

  4. Fundamental performance limits of carbon nanotube thin-film transistors achieved using hybrid molecular dielectrics.

    PubMed

    Sangwan, Vinod K; Ortiz, Rocio Ponce; Alaboson, Justice M P; Emery, Jonathan D; Bedzyk, Michael J; Lauhon, Lincoln J; Marks, Tobin J; Hersam, Mark C

    2012-08-28

    In the past decade, semiconducting carbon nanotube thin films have been recognized as contending materials for wide-ranging applications in electronics, energy, and sensing. In particular, improvements in large-area flexible electronics have been achieved through independent advances in postgrowth processing to resolve metallic versus semiconducting carbon nanotube heterogeneity, in improved gate dielectrics, and in self-assembly processes. Moreover, controlled tuning of specific device components has afforded fundamental probes of the trade-offs between materials properties and device performance metrics. Nevertheless, carbon nanotube transistor performance suitable for real-world applications awaits understanding-based progress in the integration of independently pioneered device components. We achieve this here by integrating high-purity semiconducting carbon nanotube films with a custom-designed hybrid inorganic-organic gate dielectric. This synergistic combination of materials circumvents conventional design trade-offs, resulting in concurrent advances in several transistor performance metrics such as transconductance (6.5 μS/μm), intrinsic field-effect mobility (147 cm(2)/(V s)), subthreshold swing (150 mV/decade), and on/off ratio (5 × 10(5)), while also achieving hysteresis-free operation in ambient conditions.

  5. Single frequency correction based on three-element model for thin dielectric MOS capacitor

    NASA Astrophysics Data System (ADS)

    Zhang, Xizhen; Zhu, Huichao; Cheng, Chuanhui; Yu, Tao; Zhang, Daming; Zhong, Hua; Li, Xiangping; Cheng, Yi; Xu, Xuesong; Cheng, Lihong; Sun, Jiashi; Chen, Baojiu

    2017-03-01

    For super thin dielectric MOS capacitor, capacitance extraction by using two-element model is erroneous. Three-element model, considering parasitic parameters of parallel resistance Rp and series resistance Rs, is necessary. In this paper, we develop a single frequency correction method by combining capacitance-voltage (C-V) and current-voltage (I-V) data. By equating impedances of three-element model with that of two-element model, we obtain two characteristic equations. By using a differential resistance dV/dI, we obtain the third equation. Consequently, three real parameters for the capacitance C, the Rp and the Rs are solved. As an application example of Al/HfO2/n-Si MOS, we demonstrate physically reasonable values for all three real parameters. Furthermore, dielectric loss tangent tan δ is calculated as 0.005-0.022 at 1.5 V. A simplified expression of measured capacitance Cm about the C, the Rp, the Rs and angular frequency ω has been deduced. A constraint condition for large ratio Cm/C suggests the reduction of the ratio Rs/Rp and Rs. Considering suitable values for tan δ and ratio of Cm/C, applicable frequency range is from 15 kHz to 1.1-2.1 MHz.

  6. Development of dielectric barrier discharge plasma processing apparatus for mass spectrometry and thin film deposition

    SciTech Connect

    Majumdar, Abhijit; Hippler, Rainer

    2007-07-15

    Cost effective and a very simple dielectric barrier discharge plasma processing apparatus for thin film deposition and mass spectroscopic analysis of organic gas mixture has been described. The interesting features of the apparatus are the construction of the dielectric electrodes made of aluminum oxide or alumina (Al{sub 2}O{sub 3}) and glass and the generation of high ignition voltage from the spark plug transformer taken from car. Metal capacitor is introduced in between ground and oscilloscope to measure the executing power during the discharge and the average electron density in the plasma region. The organic polymer films have been deposited on Si (100) substrate using several organic gas compositions. The experimental setup provides a unique drainage system from the reaction chamber controlled by a membrane pump to suck out and remove the poisonous gases or residuals (cyanogens, H-CN, CH{sub x}NH{sub 2}, etc.) which have been produced during the discharge of CH{sub 4}/N{sub 2} mixture.

  7. Thin-dielectric-layer engineering for 3D nanostructure integration using an innovative planarization approach

    NASA Astrophysics Data System (ADS)

    Guerfi, Y.; Doucet, J. B.; Larrieu, G.

    2015-10-01

    Three-dimensional (3D) nanostructures are emerging as promising building blocks for a large spectrum of applications. One critical issue in integration regards mastering the thin, flat, and chemically stable insulating layer that must be implemented on the nanostructure network in order to build striking nano-architectures. In this letter, we report an innovative method for nanoscale planarization on 3D nanostructures by using hydrogen silesquioxane as a spin-on-glass (SOG) dielectric material. To decouple the thickness of the final layer from the height of the nanostructure, we propose to embed the nanowire network in the insulator layer by exploiting the planarizing properties of the SOG approach. To achieve the desired dielectric thickness, the structure is chemically etched back with a highly diluted solution to control the etch rate precisely. The roughness of the top surface was less than 2 nm. There were no surface defects and the planarity was excellent, even in the vicinity of the nanowires. This newly developed process was used to realize a multilevel stack architecture with sub-deca-nanometer-range layer thickness.

  8. Millimeter Wave Sensor For On-Line Inspection Of Thin Sheet Dielectrics

    DOEpatents

    Bakhtiari, Sasan; Gopalsami, Nachappa; Raptis, Apostolos C.

    1999-03-23

    A millimeter wave sensor is provided for non-destructive inspection of thin sheet dielectric materials. The millimeter wave sensor includes a Gunn diode oscillator (GDO) source generating a mill meter wave electromagnetic energy signal having a single frequency. A heater is coupled to the GDO source for stabilizing the single frequency. A small size antenna is coupled to the GDO source for transmitting the millimeter wave electromagnetic energy signal to a sample material and for receiving a reflected millimeter wave electromagnetic energy signal from the sample material. Ferrite circulator isolators coupled between the GDO source and the antenna separate the millimeter wave electromagnetic energy signal into transmitted and received electromagnetic energy signal components and a detector detects change in both amplitude and phase of the transmitted and received electromagnetic energy signal components. A millimeter wave sensor is provided for non-destructive inspection of thin sheet dielectric materials. The millimeter wave sensor includes a Gunn diode oscillator (GDO) source generating a mill meter wave electromagnetic energy signal having a single frequency. A heater is coupled to the GDO source for stabilizing the single frequency. A small size antenna is coupled to the GDO source for transmitting the millimeter wave electromagnetic energy signal to a sample material and for receiving a reflected millimeter wave electromagnetic energy signal from the sample material. Ferrite circulator isolators coupled between the GDO source and the antenna separate the millimeter wave electromagnetic energy signal into transmitted and received electromagnetic energy signal components and a detector detects change in both amplitude and phase of the transmitted and received electromagnetic energy signal components.

  9. Superconducting structure with layers of niobium nitride and aluminum nitride

    DOEpatents

    Murduck, James M.; Lepetre, Yves J.; Schuller, Ivan K.; Ketterson, John B.

    1989-01-01

    A superconducting structure is formed by depositing alternate layers of aluminum nitride and niobium nitride on a substrate. Deposition methods include dc magnetron reactive sputtering, rf magnetron reactive sputtering, thin-film diffusion, chemical vapor deposition, and ion-beam deposition. Structures have been built with layers of niobium nitride and aluminum nitride having thicknesses in a range of 20 to 350 Angstroms. Best results have been achieved with films of niobium nitride deposited to a thickness of approximately 70 Angstroms and aluminum nitride deposited to a thickness of approximately 20 Angstroms. Such films of niobium nitride separated by a single layer of aluminum nitride are useful in forming Josephson junctions. Structures of 30 or more alternating layers of niobium nitride and aluminum nitride are useful when deposited on fixed substrates or flexible strips to form bulk superconductors for carrying electric current. They are also adaptable as voltage-controlled microwave energy sources.

  10. Superconducting structure with layers of niobium nitride and aluminum nitride

    DOEpatents

    Murduck, J.M.; Lepetre, Y.J.; Schuller, I.K.; Ketterson, J.B.

    1989-07-04

    A superconducting structure is formed by depositing alternate layers of aluminum nitride and niobium nitride on a substrate. Deposition methods include dc magnetron reactive sputtering, rf magnetron reactive sputtering, thin-film diffusion, chemical vapor deposition, and ion-beam deposition. Structures have been built with layers of niobium nitride and aluminum nitride having thicknesses in a range of 20 to 350 Angstroms. Best results have been achieved with films of niobium nitride deposited to a thickness of approximately 70 Angstroms and aluminum nitride deposited to a thickness of approximately 20 Angstroms. Such films of niobium nitride separated by a single layer of aluminum nitride are useful in forming Josephson junctions. Structures of 30 or more alternating layers of niobium nitride and aluminum nitride are useful when deposited on fixed substrates or flexible strips to form bulk superconductors for carrying electric current. They are also adaptable as voltage-controlled microwave energy sources. 8 figs.

  11. Magnetostrictive iron gallium thin films grown onto antiferromagnetic manganese nitride: Structure and magnetism

    NASA Astrophysics Data System (ADS)

    Mandru, Andrada-Oana; Corbett, Joseph P.; Richard, Andrea L.; Gallagher, James; Meng, Keng-Yuan; Ingram, David C.; Yang, Fengyuan; Smith, Arthur R.

    2016-10-01

    We report structural and magnetic properties of magnetostrictive Fe100 -xGax (x ≈ 15) alloys when deposited onto antiferromagnetic manganese nitride and non-magnetic magnesium oxide substrates. From X-ray diffraction measurements, we find that the FeGa films are single crystalline. Scanning tunneling microscopy imaging reveals that the surface morphologies are dictated by the growth temperature, composition, and substrate. The magnetic properties can be tailored by the substrate, as found by magnetic force microscopy imaging and vibrating sample magnetometry measurements. In addition to pronounced tetragonal deformations, depositing FeGa onto manganese nitride leads to the formation of stripe-like magnetic domain patterns and to the appearance of perpendicular magnetic anisotropy.

  12. Low temperature plasma-enhanced atomic layer deposition of thin vanadium nitride layers for copper diffusion barriers

    SciTech Connect

    Rampelberg, Geert; Devloo-Casier, Kilian; Deduytsche, Davy; Detavernier, Christophe; Blasco, Nicolas

    2013-03-18

    Thin vanadium nitride (VN) layers were grown by atomic layer deposition using tetrakis(ethylmethylamino)vanadium and NH{sub 3} plasma at deposition temperatures between 70 Degree-Sign C and 150 Degree-Sign C on silicon substrates and polymer foil. X-ray photoelectron spectroscopy revealed a composition close to stoichiometric VN, while x-ray diffraction showed the {delta}-VN crystal structure. The resistivity was as low as 200 {mu}{Omega} cm for the as deposited films and further reduced to 143 {mu}{Omega} cm and 93 {mu}{Omega} cm by annealing in N{sub 2} and H{sub 2}/He/N{sub 2}, respectively. A 5 nm VN layer proved to be effective as a diffusion barrier for copper up to a temperature of 720 Degree-Sign C.

  13. Single-crystal cubic boron nitride thin films grown by ion-beam-assisted molecular beam epitaxy

    SciTech Connect

    Hirama, Kazuyuki Taniyasu, Yoshitaka; Karimoto, Shin-ichi; Krockenberger, Yoshiharu; Yamamoto, Hideki

    2014-03-03

    We investigated the formation of cubic boron nitride (c-BN) thin films on diamond (001) and (111) substrates by ion-beam-assisted molecular beam epitaxy (MBE). The metastable c-BN (sp{sup 3}-bonded BN) phase can be epitaxially grown as a result of the interplay between competitive phase formation and selective etching. We show that a proper adjustment of acceleration voltage for N{sub 2}{sup +} and Ar{sup +} ions is a key to selectively discriminate non-sp{sup 3} BN phases. At low acceleration voltage values, the sp{sup 2}-bonded BN is dominantly formed, while at high acceleration voltages, etching dominates irrespective of the bonding characteristics of BN.

  14. Influence of laser pulse frequency on the microstructure of aluminum nitride thin films synthesized by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Antonova, K.; Duta, L.; Szekeres, A.; Stan, G. E.; Mihailescu, I. N.; Anastasescu, M.; Stroescu, H.; Gartner, M.

    2017-02-01

    Aluminum Nitride (AlN) thin films were synthesized on Si (100) wafers at 450 °C by pulsed laser deposition. A polycrystalline AlN target was multipulsed irradiated in a nitrogen ambient, at different laser pulse repetition rate. Grazing Incidence X-Ray Diffraction and Atomic Force Microscopy analyses evidenced nanocrystallites with a hexagonal lattice in the amorphous AlN matrix. The thickness and optical constants of the layers were determined by infrared spectroscopic ellipsometry. The optical properties were studied by Fourier Transform Infrared reflectance spectroscopy in polarised oblique incidence radiation. Berreman effect was observed around the longitudinal phonon modes of the crystalline AlN component. Angular dependence of the A1LO mode frequency was analysed and connected to the orientation of the particles' optical axis to the substrate surface normal. The role of the laser pulse frequency on the layers' properties is discussed on this basis.

  15. High-Permittivity Thin Dielectric Padding Improves Fresh Blood Imaging of Femoral Arteries at 3T

    PubMed Central

    Lindley, Marc D; Kim, Daniel; Morrell, Glen; Heilbrun, Marta E; Storey, Pippa; Hanrahan, Christopher J; Lee, Vivian S

    2014-01-01

    Objectives Fresh blood imaging (FBI) is a useful non-contrast magnetic resonance angiography (NC-MRA) method for assessment of peripheral arterial disease (PAD), particularly in patients with poor renal function. Compared with 1.5T, 3T enables higher signal to noise ratio (SNR) and/or spatio-temporal resolution in FBI, as demonstrated successfully for the calf station. However, FBI of the thigh station at 3T has been reported to suffer from signal void in the common femoral artery of one thigh only due to the radial symmetry in transmit radio-frequency field (B1+) variation. We sought to increase the femoral arterial signal attenuated by B1+ variation in FBI at 3T using high permittivity dielectric padding. Materials and Methods We performed FBI of the thigh station in 13 human subjects at 3T to compare the following 3 settings: no padding, commercially available thick (~ 5 cm) dielectric padding, and high-permittivity thin (~2 cm) dielectric padding. B1+ mapping was also performed in the common femoral arteries to characterize the radial symmetry in B1+ variation and quantify the improvement in B1+ excitation. We characterized the impact of radial symmetry in B1+ variation on the FBI signal and FBI MRA of the right common femoral artery using quantitative (i.e., contrast-to-noise ratio (CNR)) and qualitative (i.e., conspicuity) analyses. Results The radial symmetry in B1+ variation attenuates signal in the right common femoral artery, which can be partially improved with commercial padding and improved further with high permittivity padding. Averaging the results over 13 subjects, the B1+, CNR and conspicuity scores in the right common femoral artery were significantly better with high-permittivity padding than with commercial padding and baseline (p<0.001). Conclusions Our study shows that high-permittivity dielectric padding can be used to increase the femoral arterial signal attenuated by B1+ variation in FBI at 3T. PMID:25329606

  16. Influence of Strain on Thermal Conductivity of Silicon Nitride Thin Films

    DTIC Science & Technology

    2012-03-02

    silicon nitride process for surface-micromachining applications Sensors Actuators A 58 149–57 [42] Poetzsch R H and Bottger H 1994 Interplay of disorder...NUMBER 5c. PROGRAM ELEMENT NUMBER 6. AUTHOR(S) 5d. PROJECT NUMBER 5e. TASK NUMBER 5f. WORK UNIT NUMBER 7. PERFORMING ORGANIZATION NAME(S) AND...ADDRESS(ES) Air Force Research Laboratory,Thermal Sciences and Materials Branch,Wright-Patterson Air Force Base,OH,45433 8. PERFORMING ORGANIZATION REPORT

  17. Ionizing and Non-ionizing Radiation Effects in Thin Layer Hexagonal Boron Nitride

    DTIC Science & Technology

    2015-03-01

    M-099 Abstract The radiation response of 14nm h-BN/Si metal insulator semiconductor (MIS) devices was investigated using current-voltage and... insulator and passivation layers to maintain performance, but options are limited. Hexagonal boron nitride (h-BN) is one candidate for use with...graphene-based electronic systems because it has the same lattice structure as graphene, is an insulator , and is known to form on graphene surfaces. h

  18. Theory and practical considerations of multilayer dielectric thin-film stacks in Ag-coated hollow waveguides.

    PubMed

    Bledt, Carlos M; Melzer, Jeffrey E; Harrington, James A

    2014-02-01

    This analysis explores the theory and design of dielectric multilayer reflection-enhancing thin film stacks based on high and low refractive index alternating layers of cadmium sulfide (CdS) and lead sulfide (PbS) on silver (Ag)-coated hollow glass waveguides (HGWs) for low loss transmission at midinfrared wavelengths. The fundamentals for determining propagation losses in such multilayer thin-film-coated Ag hollow waveguides is thoroughly discussed, and forms the basis for further theoretical analysis presented in this study. The effects on propagation loss resulting from several key parameters of these multilayer thin film stacks is further explored in order to bridge the gap between results predicted through calculation under ideal conditions and deviations from such ideal models that often arise in practice. In particular, the effects on loss due to the number of dielectric thin film layers deposited, deviation from ideal individual layer thicknesses, and surface roughness related scattering losses are presented and thoroughly investigated. Through such extensive theoretical analysis the level of understanding of the underlying loss mechanisms of multilayer thin-film Ag-coated HGWs is greatly advanced, considerably increasing the potential practical development of next-generation ultralow-loss mid-IR Ag/multilayer dielectric-coated HGWs.

  19. A mixed solution-processed gate dielectric for zinc-tin oxide thin-film transistor and its MIS capacitance

    NASA Astrophysics Data System (ADS)

    Kim, Hunho; Kwack, Young-Jin; Yun, Eui-Jung; Choi, Woon-Seop

    2016-09-01

    Solution-processed gate dielectrics were fabricated with the combined ZrO2 and Al2O3 (ZAO) in the form of mixed and stacked types for oxide thin film transistors (TFTs). ZAO thin films prepared with double coatings for solid gate dielectrics were characterized by analytical tools. For the first time, the capacitance of the oxide semiconductor was extracted from the capacitance-voltage properties of the zinc-tin oxide (ZTO) TFTs with the combined ZAO dielectrics by using the proposed metal-insulator-semiconductor (MIS) structure model. The capacitance evolution of the semiconductor from the TFT model structure described well the threshold voltage shift observed in the ZTO TFT with the ZAO (1:2) gate dielectric. The electrical properties of the ZTO TFT with a ZAO (1:2) gate dielectric showed low voltage driving with a field effect mobility of 37.01 cm2/Vs, a threshold voltage of 2.00 V, an on-to-off current ratio of 1.46 × 105, and a subthreshold slope of 0.10 V/dec.

  20. Effect of substitution group on dielectric properties of 4H-pyrano [3, 2-c] quinoline derivatives thin films

    NASA Astrophysics Data System (ADS)

    H, M. Zeyada; F, M. El-Taweel; M, M. El-Nahass; M, M. El-Shabaan

    2016-07-01

    The AC electrical conductivity and dielectrical properties of 2-amino-6-ethyl-5-oxo-4-(3-phenoxyphenyl)-5,6-dihydro-4H-pyrano[3, 2-c]quinoline-3-carbonitrile (Ph-HPQ) and 2-amino-4-(2-chlorophenyl)-6-ethyl-5-oxo-5,6-dihydro-4H-pyrano [3, 2-c] quinoline-3-carbonitrile (Ch-HPQ) thin films were determined in the frequency range of 0.5 kHz-5 MHz and the temperature range of 290-443 K. The AC electrical conduction of both compounds in thin film form is governed by the correlated barrier hopping (CBH) mechanism. Some parameters such as the barrier height, the maximum barrier height, the density of charges, and the hopping distance were determined as functions of temperature and frequency. The phenoxyphenyl group has a greater influence on those parameters than the chlorophenyl group. The AC activation energies were determined at different frequencies and temperatures. The dielectric behaviors of Ph-HPQ and Ch-HPQ were investigated using the impedance spectroscopy technique. The impedance data are presented in Nyquist diagrams for different temperatures. The Ch-HPQ films have higher impedance than the Ph-HPQ films. The real dielectric constant and dielectric loss show a remarkable dependence on the frequency and temperature. The Ph-HPQ has higher dielectric constants than the Ch-HPQ.

  1. A mixed solution-processed gate dielectric for zinc-tin oxide thin-film transistor and its MIS capacitance

    PubMed Central

    Kim, Hunho; Kwack, Young-Jin; Yun, Eui-Jung; Choi, Woon-Seop

    2016-01-01

    Solution-processed gate dielectrics were fabricated with the combined ZrO2 and Al2O3 (ZAO) in the form of mixed and stacked types for oxide thin film transistors (TFTs). ZAO thin films prepared with double coatings for solid gate dielectrics were characterized by analytical tools. For the first time, the capacitance of the oxide semiconductor was extracted from the capacitance-voltage properties of the zinc-tin oxide (ZTO) TFTs with the combined ZAO dielectrics by using the proposed metal-insulator-semiconductor (MIS) structure model. The capacitance evolution of the semiconductor from the TFT model structure described well the threshold voltage shift observed in the ZTO TFT with the ZAO (1:2) gate dielectric. The electrical properties of the ZTO TFT with a ZAO (1:2) gate dielectric showed low voltage driving with a field effect mobility of 37.01 cm2/Vs, a threshold voltage of 2.00 V, an on-to-off current ratio of 1.46 × 105, and a subthreshold slope of 0.10 V/dec. PMID:27641430

  2. Full range dielectric characteristics of calcium copper titanate thin films prepared by continuous composition-spread sputtering.

    PubMed

    Kang, Hyo Min; Baek, Seung-Hyub; Song, Jong Han; Cho, Yong Soo; Choi, Ji-Won

    2014-09-08

    Perovskite CaCu3Ti4O12 has drawn a great deal of attention for various electronic applications due to its giant dielectric property as well as a strong stability in a wide range of temperature. In this paper, we use an off-axis continuous composition-spread (CCS) sputtering method to investigate the full range dielectric characteristics of calcium copper titanate thin films. The film compositions are continuously distributed by deposition from two targets of CaTiO3 and CuTiO3. A slightly Ca-deficient, Cu- and Ti-rich film, which has a 0.9:3.2:4.3 ratio for Ca:Cu:Ti, demonstrated the best performance by showing a dielectric constant of 781 at 100 kHz. On the other hand, all other films far away from the CaCu3Ti4O12 composition showed suppressed dielectric properties. Analyses by X-ray photon spectroscopy, micro-Raman microscopy, transmission electron microscopy, and Rutherford backscattering spectroscopy reveal that there are three possible origins for such superior performance at off stoichiometric thin films: (1) bulk doping by excessive Cu and Ti ions, (2) chemically modified grain boundary, and (3) the lowered electrode-sample interface resistance. Our result will provide a new insight into engineering the dielectric properties using off-stoichiometric synthesis.

  3. A uniform GTD analysis of the EM diffraction by a thin dielectric/ferrite half-plane and related configurations

    NASA Technical Reports Server (NTRS)

    Rojas, Roberto G.

    1985-01-01

    A uniform geometrical theory of diffraction (UTD) solution is developed for the problem of the diffraction by a thin dielectric/ferrite half plane when it is excited by a plane, cylindrical, or surface wave field. Both transverse electric and transverse magnetic cases are considered. The solution of this problem is synthesized from the solutions to the related problems of EM diffraction by configurations involving perfectly conducting electric and magnetic walls covered by a dielectric/ferrite half-plane of one half the thickness of the original half-plane.

  4. Deposition and characterization of zirconium nitride (ZrN) thin films by reactive magnetron sputtering with linear gas ion source and bias voltage

    SciTech Connect

    Kavitha, A.; Kannan, R.; Subramanian, N. Sankara; Loganathan, S.

    2014-04-24

    Zirconium nitride thin films have been prepared on stainless steel substrate (304L grade) by reactive cylindrical magnetron sputtering method with Gas Ion Source (GIS) and bias voltage using optimized coating parameters. The structure and surface morphologies of the ZrN films were characterized using X-ray diffraction, atomic microscopy and scanning electron microscopy. The adhesion property of ZrN thin film has been increased due to the GIS. The coating exhibits better adhesion strength up to 10 N whereas the ZrN thin film with bias voltage exhibits adhesion up to 500 mN.

  5. A study on the ESD damage of a silicon oxy-nitride hard mask on the chromium surface of PSM blank

    NASA Astrophysics Data System (ADS)

    Moon, Songbae; Kim, Heebom; Shin, Inkyun; Jeon, Chanuk

    2013-09-01

    A thin silicon oxy-nitride hard mask on the PSM blank is needed for the feature patterning with the size smaller than 70 nm. It is a good material for hard mask. However, the electrical property of silicon oxy-nitride with the thickness smaller than 10 nm causes the chromium surface damage during the mask processes. From the measurement of the surface damage, we figure out that the chromium surface damage is originated from the charging and the dielectric breakdown phenomena. In our present work, two types of silicon oxy-nitride film with the thicknesses of 5 nm and 12 nm are tested for verifying optimal mask fabrication processes. We find that the occurrence of ESD damage is related to the thickness of silicon oxy-nitride hard mask and mask fabrication process conditions. The optimal fabrication process condition for silicon oxy-nitride thin film hard mask, in which break-down never occurs, is discussed.

  6. Uniform Non-stoichiometric Titanium Nitride Thin Films for Improved Kinetic Inductance Detector Arrays

    NASA Astrophysics Data System (ADS)

    Coiffard, G.; Schuster, K.-F.; Driessen, E. F. C.; Pignard, S.; Calvo, M.; Catalano, A.; Goupy, J.; Monfardini, A.

    2016-08-01

    We describe the fabrication of homogeneous sub-stoichiometric titanium nitride films for microwave kinetic inductance detector (KID) arrays. Using a 6'' sputtering target and a homogeneous nitrogen inlet, the variation of the critical temperature over a 2'' wafer was reduced to {<}25 %. Measurements of a 132-pixel KID arrays from these films reveal a sensitivity of 16 kHz/pW in the 100 GHz band, comparable to the best aluminum KIDs. We measured a noise equivalent power of NEP = 3.6× 10^{-15} W/Hz^{1/2}. Finally, we describe possible routes to further improve the performance of these TiN KID arrays.

  7. Nanosecond laser-induced nanostructuring of thin metal layers and dielectric surfaces

    NASA Astrophysics Data System (ADS)

    Lorenz, P.; Klöppel, M.; Ehrhardt, M.; Zimmer, K.; Schwaller, P.

    2015-03-01

    Nanostructuring of dielectric surfaces has a widespread field of applications. In this work the recently introduced laser method validates this novel concept for complex nanostructuring of dielectric surfaces. This concept combines the mechanism of self-assembly of metal films due to laser irradiation with the concept of laser-assisted transfer of these patterns into the underlying material. The present work focuses on pattern formation in fused silica near the border of the laser spot, where distorted nested ring-like patterns were found in contrast to concentric ring patterns at homogeneous laser irradiation. For the experiments a lateral homogeneous spot of a KrF excimer laser (λ = 248 nm) and a Gaussian beam Yb fiber laser (λ = 1064 nm) was used for irradiation of a thin chromium layer onto fused silica resulting in the formation of different ring structures into the fused silica surface. The obtained structures were analysed by AFM and SEM. It is found that the mechanism comprises laser-induced metal film melting, contraction of the molten metal, and successive transfer of the metal hole geometry to the fused silica. Simulations taking into account the heat and the Navier-Stokes equations were compared with the experimental results. A good agreement of simulation results with experimental data was found. These first results demonstrate that the variation of the laser beam profile allows the local control of the melt dynamics which causes changes of the shape and the size of the ring patterns. Hence, a light-controlled self-assembly is feasible.

  8. Microwave dielectric dispersion in a multiferroic Pb(Fe1/2Nb1/2)O3 thin film

    NASA Astrophysics Data System (ADS)

    Sobiestianskas, R.; Peng, W.; Lemée, N.; Karkut, M.; Banys, J.; Holc, J.; Kosec, M.

    2012-03-01

    We present the dielectric dispersion in a Pb(Fe1/2Nb1/2)O3 (PFN) thin film grown on (001) SrTiO3 substrate from 20 MHz to 20 GHz in the temperature range of 270 to 340 K. In the radio frequency region, the hopping charge transport and associated polar nanoregion and/or domain-wall motion contribute to the spectrum. In the microwave region, relaxational dispersion was observed with a dielectric contribution of Δɛ ≈ 600 at room temperature having a characteristic frequency (fm)0.4 = 9.8 . (T-T0) Hz, where T0 is 660 K. It is associated with possible mode-softening behavior, related to the onset of polar nanoregions at T0. The dielectric permittivity shows similarities with 1-dimensional Ising model behaviour.

  9. Preparation and electrical properties of (Zr,Sn)TiO{sub 4} dielectric thin films by laser ablation

    SciTech Connect

    Nakagawara, Osamu; Toyota, Yuji; Kobayashi, Masato; Yoshino, Yukio; Katayama, Yuzo; Tabata, Hitoshi; Kawai, Tomoji

    1996-11-01

    (Zr,Sn)TiO{sub 4} is considered as a promising dielectric material for microwave devices owing to the temperature stability of capacitance and excellent microwave properties. Preferential (111)-oriented (Zr,Sn)TiO{sub 4} thin film was obtained by an ArF laser ablation. Properties of the crystallized film were as follows; the temperature coefficient of capacitance TCC was 17.6 ppm/C at 3 MHz and the dielectric constant {var_epsilon}{sub r}, 38 in the microwave range of 1GHZ--10GHz. It has turned out that the crystallization of this material is quite effective for improving dielectrical properties. Surface morphologies were observed by atomic force microscope (AFM). Grains grew on the crystallized film at 1 {micro}m x 1 {micro}m size.

  10. Stable dielectric response of low-loss aromatic polythiourea thin films on Pt/SiO2 substrate

    NASA Astrophysics Data System (ADS)

    Eršte, A.; Fulanović, L.; Čoga, L.; Lin, M.; Thakur, Y.; Zhang, Q. M.; Bobnar, V.

    2016-03-01

    We have investigated dielectric properties of aromatic polythiourea (ArPTU, a polar polymer containing high dipolar moments with very low defect levels) thin films that were developed on Pt/SiO2 substrate. The detected response is compared to the response of commercially available polymers, such as high density polyethylene (HDPE) and polypropylene (PP), which are at present used in foil capacitors. Stable values of the dielectric constant ɛ‧≈5 (being twice higher than in HDPE and PP) over broad temperature and frequency ranges and dielectric losses as low as in commercial systems suggest ArPTU as a promising candidate for future use in a variety of applications.

  11. Recombination and thin film properties of silicon nitride and amorphous silicon passivated c-Si following ammonia plasma exposure

    SciTech Connect

    Wan, Yimao; Thomson, Andrew F.; Cuevas, Andres; McIntosh, Keith R.

    2015-01-26

    Recombination at silicon nitride (SiN{sub x}) and amorphous silicon (a-Si) passivated crystalline silicon (c-Si) surfaces is shown to increase significantly following an ammonia (NH{sub 3}) plasma exposure at room temperature. The effect of plasma exposure on chemical structure, refractive index, permittivity, and electronic properties of the thin films is also investigated. It is found that the NH{sub 3} plasma exposure causes (i) an increase in the density of Si≡N{sub 3} groups in both SiN{sub x} and a-Si films, (ii) a reduction in refractive index and permittivity, (iii) an increase in the density of defects at the SiN{sub x}/c-Si interface, and (iv) a reduction in the density of positive charge in SiN{sub x}. The changes in recombination and thin film properties are likely due to an insertion of N–H radicals into the bulk of SiN{sub x} or a-Si. It is therefore important for device performance to minimize NH{sub 3} plasma exposure of SiN{sub x} or a-Si passivating films during subsequent fabrication steps.

  12. Atomic layer deposited tungsten nitride thin films as a new lithium-ion battery anode.

    PubMed

    Nandi, Dip K; Sen, Uttam K; Sinha, Soumyadeep; Dhara, Arpan; Mitra, Sagar; Sarkar, Shaibal K

    2015-07-14

    This article demonstrates the atomic layer deposition (ALD) of tungsten nitride using tungsten hexacarbonyl [W(CO)6] and ammonia [NH3] and its use as a lithium-ion battery anode. In situ quartz crystal microbalance (QCM), ellipsometry and X-ray reflectivity (XRR) measurements are carried out to confirm the self-limiting behaviour of the deposition. A saturated growth rate of ca. 0.35 Å per ALD cycle is found within a narrow temperature window of 180-195 °C. In situ Fourier transform infrared (FTIR) vibrational spectroscopy is used to determine the reaction pathways of the surface bound species after each ALD half cycle. The elemental presence and chemical composition is determined by XPS. The as-deposited material is found to be amorphous and crystallized to h-W2N upon annealing at an elevated temperature under an ammonia atmosphere. The as-deposited materials are found to be n-type, conducting with an average carrier concentration of ca. 10(20) at room temperature. Electrochemical studies of the as-deposited films open up the possibility of this material to be used as an anode material in Li-ion batteries. The incorporation of MWCNTs as a scaffold layer further enhances the electrochemical storage capacity of the ALD grown tungsten nitride (WNx). Ex situ XRD analysis confirms the conversion based reaction mechanism of the as-grown material with Li under operation.

  13. Surface enhanced Raman scattering activity of TiN thin film prepared via nitridation of sol-gel derived TiO2 film

    NASA Astrophysics Data System (ADS)

    Dong, Zhanliang; Wei, Hengyong; Chen, Ying; Wang, Ruisheng; Zhao, Junhong; Lin, Jian; Bu, Jinglong; Wei, Yingna; Cui, Yi; Yu, Yun

    2015-10-01

    Surface-enhanced Raman scattering (SERS) is a powerful and non-destructive analytical technique tool for chemical and biological sensing applications. Metal-free SERS substrates have recently been developed by using semiconductor nanostructures. The optical property of TiN film is similar to that of gold. Besides that, its good chemical inertness and thermodynamic stability make TiN thin film an excellent candidate for SERS. In order to investigate its SERS activity, the TiN thin film was successfully prepared via direct nitridation of the sol-gel derived TiO2 thin film on the quartz substrate using ammonia gas as reducing agent. The crystallite structures and morphology of TiN thin film were determined by XRD, RAMAN and FE-SEM. The results show that the thin film obtained is cubic titanium nitride with a lattice parameter of 4.2349 Å. The surface of TiN thin film is rough and with the particles of 50 nm in average sizes. The thickness of TiN thin film is about 130 nm. The TiN thin film displays a surface Plasmon resonance absorption peak at around 476 nm, which can lead to a strong enhancement of the EM field on the interface. The Raman signal of the probe molecule R6G was greatly enhanced through TiN thin film substrates. The enhancement factor is about 4.1×103 and the detection limit achieves 10-6 M for R6G. The TiN thin film substrate also shows a good reproducibility of SERS performance. The results indicate that TiN thin film is an attractive material with potential application in SERS substrates.

  14. Temporally and spatially resolved plasma spectroscopy in pulsed laser deposition of ultra-thin boron nitride films

    NASA Astrophysics Data System (ADS)

    Glavin, Nicholas R.; Muratore, Christopher; Jespersen, Michael L.; Hu, Jianjun; Fisher, Timothy S.; Voevodin, Andrey A.

    2015-04-01

    Physical vapor deposition (PVD) has recently been investigated as a viable, alternative growth technique for two-dimensional materials with multiple benefits over other vapor deposition synthesis methods. The high kinetic energies and chemical reactivities of the condensing species formed from PVD processes can facilitate growth over large areas and at reduced substrate temperatures. In this study, chemistry, kinetic energies, time of flight data, and spatial distributions within a PVD plasma plume ablated from a boron nitride (BN) target by a KrF laser at different pressures of nitrogen gas were investigated. Time resolved spectroscopy and wavelength specific imaging were used to identify and track atomic neutral and ionized species including B+, B*, N+, N*, and molecular species including N2*, N2+, and BN. Formation and decay of these species formed both from ablation of the target and from interactions with the background gas were investigated and provided insights into fundamental growth mechanisms of continuous, amorphous boron nitride thin films. The correlation of the plasma diagnostic results with film chemical composition and thickness uniformity studies helped to identify that a predominant mechanism for BN film formation is condensation surface recombination of boron ions and neutral atomic nitrogen species. These species arrive nearly simultaneously to the substrate location, and BN formation occurs microseconds before arrival of majority of N+ ions generated by plume collisions with background molecular nitrogen. The energetic nature and extended dwelling time of incident N+ ions at the substrate location was found to negatively impact resulting BN film stoichiometry and thickness. Growth of stoichiometric films was optimized at enriched concentrations of ionized boron and neutral atomic nitrogen in plasma near the condensation surface, providing few nanometer thick films with 1:1 BN stoichiometry and good thicknesses uniformity over macroscopic areas.

  15. Investigations on laser printing of microcapacitors using poly (methyl methacrylate) dielectric thin films for organic electronics applications

    NASA Astrophysics Data System (ADS)

    Constantinescu, Catalin; Rapp, Ludovic; Delaporte, Philippe; Alloncle, Anne-Patricia

    2016-06-01

    Thin solid pixels made of Ag/PMMA stacks have been fabricated by laser-induced forward transfer (LIFT), to be tested as thin film microcapacitors in organic electronics applications. The square-shaped laser-printed pixels have a lateral size of ∼350 μm, and the thickness of the dielectric film was varied between 100 and 1500 nm. The pixels were deposited on electrode structures made by LIFT printing of silver nanoparticles ink and paste. Optimal printing conditions led to the fabrication of microcapacitors with typical capacitance in the pF range, tuned by changing the properties of the multilayered structure (e.g. pixel size and/or thickness of the dielectric). Their stability was also investigated over time. We discuss on the morphological and electrical properties of such laser-printed structures, with respect to the impact resistance of the polymer and its suitability for the LIFT process.

  16. Effects of annealing conditions on the dielectric properties of solution-processed Al2O3 layers for indium-zinc-tin-oxide thin-film transistors.

    PubMed

    Kim, Yong-Hoon; Kim, Kwang-Ho; Park, Sung Kyu

    2013-11-01

    In this paper, the effects of annealing conditions on the dielectric properties of solution-processed aluminum oxide (Al2O3) layers for indium-zinc-tin-oxide (IZTO) thin-film transistors (TFTs) have been investigated. The dielectric properties of Al2O3 layers such as leakage current density and dielectric strength were largely affected by their annealing conditions. In particular, oxygen partial pressure in rapid thermal annealing, and the temperature profile of hot plate annealing had profound effects on the dielectric properties. From a refractive index analysis, the enhanced dielectric properties of Al2O3 gate dielectrics can be attributed to higher film density depending on the annealing conditions. With the low-temperature-annealed Al2O3 gate dielectric at 350 degrees C, solution-processed IZTO TFTs with a field-effect mobility of approximately 2.2 cm2/Vs were successfully fabricated.

  17. Composite surface-plasmon-polariton waves guided by a thin metal layer sandwiched between a homogeneous isotropic dielectric material and a periodically multilayered isotropic dielectric material

    NASA Astrophysics Data System (ADS)

    Chiadini, Francesco; Fiumara, Vincenzo; Scaglione, Antonio; Lakhtakia, Akhlesh

    2015-01-01

    Multiple p- and s-polarized compound surface-plasmon-polariton (SPP) waves at a fixed frequency can be guided by a structure consisting of a metal layer sandwiched between a homogeneous isotropic dielectric (HID) material and a periodic multilayered isotropic dielectric (PMLID) material. For any thickness of the metal layer, at least one compound SPP wave must exist. It possesses the p-polarization state, and is strongly bound to the metal/HID interface when the metal thickness is large but to both metal/dielectric interfaces when the metal thickness is small. When the metal layer vanishes, this compound SPP wave transmutes into a Tamm wave. Additional compound SPP waves exist, depending on the thickness of the metal layer, the relative permittivity of the HID material, and the period and composition of the PMLID material. Some of these are p-polarized, the others are s-polarized. All of them differ in phase speed, attenuation rate, and field profile, even though all are excitable at the same frequency. The multiplicity and dependence of the number of compound SPP waves on the relative permittivity of the HID material when the metal layer is thin could be useful for optical sensing applications and intrachip plasmonic optical communication.

  18. Structure, mechanical properties, and high-temperature stability of nanolayered titanium nitride/titanium diboride and zirconium nitride/zirconium diboride thin films

    NASA Astrophysics Data System (ADS)

    Martin, Keith Joseph

    2001-07-01

    The focus of this research is the deposition, structure, mechanical properties, and high temperature stability of polycrystalline nanolayered thin films. TiN/TiB2 and ZrN/ZrB2 nanolayers were magnetron sputtered with periods (Λ) ranging from 2 to 28 nm. The films were chemically and structurally characterized using Auger electron spectroscopy (AES), X-ray diffraction (XRD) and transmission electron microscopy (TEM). The mechanical properties were characterized using nanoindentation, scratch testing, Rockwell indentation, and substrate curvature measurements. High temperature annealing, 750--1100°C, was used to investigate the thermal stability of the layered structures. As-deposited TiN/TiB2 and ZrN/ZrB2 nanolayers displayed an amorphous structure for the boride layers and a (200) and (111) preferred orientation for TiN and ZrN respectively. Annealing of the coatings was required to crystallize the diboride layers. XRD showed the presence of a mixed orientation (001) and (101) TiB2 and (001) ZrB2. The improved crystallinity raised the nanolayer hardness from a maximum of 38 GPa to 49 GPa for both material systems, a hardness enhancement of ~25% over the rule-of-mixtures value for the constituent materials. Analysis of the annealed TiN/TiB 2 microstructure with TEM revealed a randomly oriented, rotated nanolayer domain structure. The deposition process used allowed for variation of the substrate bias voltage, thereby allowing the production of nanolayered coatings with different amounts of residual stress. Increasing the amount of compressive stress was shown to have a positive effect on hardness, but was detrimental to film/substrate adhesion. The compressive stress of the nanolayered coatings was observed to be as much as 7 times less than the monolithic component materials. The interface structure was assumed to allow for stress relaxation through point defect annihilation and stress compensation. Deposition of a series of nanolayers with differing interface

  19. High-Quality Solution-Processed Silicon Oxide Gate Dielectric Applied on Indium Oxide Based Thin-Film Transistors.

    PubMed

    Jaehnike, Felix; Pham, Duy Vu; Anselmann, Ralf; Bock, Claudia; Kunze, Ulrich

    2015-07-01

    A silicon oxide gate dielectric was synthesized by a facile sol-gel reaction and applied to solution-processed indium oxide based thin-film transistors (TFTs). The SiOx sol-gel was spin-coated on highly doped silicon substrates and converted to a dense dielectric film with a smooth surface at a maximum processing temperature of T = 350 °C. The synthesis was systematically improved, so that the solution-processed silicon oxide finally achieved comparable break downfield strength (7 MV/cm) and leakage current densities (<10 nA/cm(2) at 1 MV/cm) to thermally grown silicon dioxide (SiO2). The good quality of the dielectric layer was successfully proven in bottom-gate, bottom-contact metal oxide TFTs and compared to reference TFTs with thermally grown SiO2. Both transistor types have field-effect mobility values as high as 28 cm(2)/(Vs) with an on/off current ratio of 10(8), subthreshold swings of 0.30 and 0.37 V/dec, respectively, and a threshold voltage close to zero. The good device performance could be attributed to the smooth dielectric/semiconductor interface and low interface trap density. Thus, the sol-gel-derived SiO2 is a promising candidate for a high-quality dielectric layer on many substrates and high-performance large-area applications.

  20. ZnO-based thin film transistors employing aluminum titanate gate dielectrics deposited by spray pyrolysis at ambient air.

    PubMed

    Afouxenidis, Dimitrios; Mazzocco, Riccardo; Vourlias, Georgios; Livesley, Peter J; Krier, Anthony; Milne, William I; Kolosov, Oleg; Adamopoulos, George

    2015-04-08

    The replacement of SiO2 gate dielectrics with metal oxides of higher dielectric constant has led to the investigation of a wide range of materials with superior properties compared with SiO2. Despite their attractive properties, these high-k dielectrics are usually manufactured using costly vacuum-based techniques. To overcome this bottleneck, research has focused on the development of alternative deposition methods based on solution-processable metal oxides. Here we report the application of spray pyrolysis for the deposition and investigation of Al2x-1·TixOy dielectrics as a function of the [Ti(4+)]/[Ti(4+)+2·Al(3+)] ratio and their implementation in thin film transistors (TFTs) employing spray-coated ZnO as the active semiconducting channels. The films are studied by UV-visible absorption spectroscopy, spectroscopic ellipsometry, impedance spectroscopy, atomic force microscopy, X-ray diffraction and field-effect measurements. Analyses reveal amorphous Al2x-1·TixOy dielectrics that exhibit a wide band gap (∼4.5 eV), low roughness (∼0.9 nm), high dielectric constant (k ∼ 13), Schottky pinning factor S of ∼0.44 and very low leakage currents (<5 nA/cm(2)). TFTs employing stoichiometric Al2O3·TiO2 gate dielectrics and ZnO semiconducting channels exhibit excellent electron transport characteristics with low operating voltages (∼10 V), negligible hysteresis, high on/off current modulation ratio of ∼10(6), subthreshold swing (SS) of ∼550 mV/dec and electron mobility of ∼10 cm(2) V(-1) s(-1).

  1. Cancer cells (MCF-7, Colo-357, and LNCaP) viability on amorphous hydrogenated carbon nitride film deposited by dielectric barrier discharge plasma

    SciTech Connect

    Majumdar, Abhijit; Hippler, Rainer; Ummanni, Ramesh; Walther, Reinhard; Schroeder, Karsten

    2009-08-01

    Atmospheric pressure dielectric barrier discharge plasma in CH{sub 4}/N{sub 2} (1:1) gas mixture has been employed to deposit amorphous hydrogenated carbon nitride (aH-CN{sub x}) film. In vitro studies with three different cancer cell lines were carried out on the coated surfaces. Preliminary biocompatibility and effect of CH{sub 4}/N{sub 2} films have been investigated by measuring cell proliferation. Three different cancer cell (MCF-7, Colo-357, and LNCaP) suspensions have been exposed on the surface of aH-CN{sub x} film to investigate the effect of deposited films on viability of cells. Results from the MTS (3-(4,5-dimethylthiazol-2-yl)-5-(3-carboxymethoxyphenyl)-2- (4-sulfophenyl)-2H- tetrazolium, inner salt) proliferation assays indicated that the deposited aH-CN{sub x} film is cytotoxic to cancer cell lines. Time course cell viability assay indicated maximum cell death at 24 h after seeding the cells. This effect is dependant on physicochemical and mechanical properties of the deposited films. The deposited film has been characterized by x-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The results confirm the presence of C-N, Cident toN, C-H{sub x}, C-O, N-O, overlapping NH, and OH bonds in the film.

  2. Cancer cells (MCF-7, Colo-357, and LNCaP) viability on amorphous hydrogenated carbon nitride film deposited by dielectric barrier discharge plasma

    NASA Astrophysics Data System (ADS)

    Majumdar, Abhijit; Ummanni, Ramesh; Schröder, Karsten; Walther, Reinhard; Hippler, Rainer

    2009-08-01

    Atmospheric pressure dielectric barrier discharge plasma in CH4/N2 (1:1) gas mixture has been employed to deposit amorphous hydrogenated carbon nitride (aH-CNx) film. In vitro studies with three different cancer cell lines were carried out on the coated surfaces. Preliminary biocompatibility and effect of CH4/N2 films have been investigated by measuring cell proliferation. Three different cancer cell (MCF-7, Colo-357, and LNCaP) suspensions have been exposed on the surface of aH-CNx film to investigate the effect of deposited films on viability of cells. Results from the MTS (3-(4,5-dimethylthiazol-2-yl)-5-(3-carboxymethoxyphenyl)-2-(4-sulfophenyl)-2H- tetrazolium, inner salt) proliferation assays indicated that the deposited aH-CNx film is cytotoxic to cancer cell lines. Time course cell viability assay indicated maximum cell death at 24 h after seeding the cells. This effect is dependant on physicochemical and mechanical properties of the deposited films. The deposited film has been characterized by x-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. The results confirm the presence of C-N, C≡N, C-Hx, C-O, N-O, overlapping NH, and OH bonds in the film.

  3. 1/f noise in thin oxide p-channel metal-nitride-oxide-silicon transistors

    NASA Astrophysics Data System (ADS)

    Maes, Herman E.; Usmani, Sabir H.

    1983-04-01

    The 1/f noise behavior of p-channel metal-nitride-oxide-silicon transistors is presented. Devices with different oxide thicknesses, geometries and different technological treatments were used for this study. It is shown that the noise behavior can be well explained quantitatively with the number fluctuation model developed for MOS transistors. The close correlation between the increase of the noise and of the interface state density after different levels of degradation indeed indicates that the exchange of carriers between the channel and the interface traps lies at the origin of the 1/f noise. The observed degradation in MNOS devices is consistent with a diffusion controlled model for the creation of surface traps but is found to be a saturating effect. The predictions of the mobility fluctuation model are not confirmed in our experiments.

  4. Atomic Layer Deposited Thin Films for Dielectrics, Semiconductor Passivation, and Solid Oxide Fuel Cells

    NASA Astrophysics Data System (ADS)

    Xu, Runshen

    Atomic layer deposition (ALD) utilizes sequential precursor gas pulses to deposit one monolayer or sub-monolayer of material per cycle based on its self-limiting surface reaction, which offers advantages, such as precise thickness control, thickness uniformity, and conformality. ALD is a powerful means of fabricating nanoscale features in future nanoelectronics, such as contemporary sub-45 nm metal-oxide-semiconductor field effect transistors, photovoltaic cells, near- and far-infrared detectors, and intermediate temperature solid oxide fuel cells. High dielectric constant, kappa, materials have been recognized to be promising candidates to replace traditional SiO2 and SiON, because they enable good scalability of sub-45 nm MOSFET (metal-oxide-semiconductor field-effect transistor) without inducing additional power consumption and heat dissipation. In addition to high dielectric constant, high-kappa materials must meet a number of other requirements, such as low leakage current, high mobility, good thermal and structure stability with Si to withstand high-temperature source-drain activation annealing. In this thesis, atomic layer deposited Er2O3 doped TiO2 is studied and proposed as a thermally stable amorphous high-kappa dielectric on Si substrate. The stabilization of TiO2 in its amorphous state is found to achieve a high permittivity of 36, a hysteresis voltage of less than 10 mV, and a low leakage current density of 10-8 A/cm-2 at -1 MV/cm. In III-V semiconductors, issues including unsatisfied dangling bonds and native oxides often result in inferior surface quality that yields non-negligible leakage currents and degrades the long-term performance of devices. The traditional means for passivating the surface of III-V semiconductors are based on the use of sulfide solutions; however, that only offers good protection against oxidation for a short-term (i.e., one day). In this work, in order to improve the chemical passivation efficacy of III-V semiconductors

  5. Aqueous combustion synthesis of aluminum oxide thin films and application as gate dielectric in GZTO solution-based TFTs.

    PubMed

    Branquinho, Rita; Salgueiro, Daniela; Santos, Lídia; Barquinha, Pedro; Pereira, Luís; Martins, Rodrigo; Fortunato, Elvira

    2014-11-26

    Solution processing has been recently considered as an option when trying to reduce the costs associated with deposition under vacuum. In this context, most of the research efforts have been centered in the development of the semiconductors processes nevertheless the development of the most suitable dielectrics for oxide based transistors is as relevant as the semiconductor layer itself. In this work we explore the solution combustion synthesis and report on a completely new and green route for the preparation of amorphous aluminum oxide thin films; introducing water as solvent. Optimized dielectric layers were obtained for a water based precursor solution with 0.1 M concentration and demonstrated high capacitance, 625 nF cm(-2) at 10 kHz, and a permittivity of 7.1. These thin films were successfully applied as gate dielectric in solution processed gallium-zinc-tin oxide (GZTO) thin film transistors (TFTs) yielding good electrical performance such as subthreshold slope of about 0.3 V dec(-1) and mobility above 1.3 cm2 V(-1) s(-1).

  6. Hole mobility modulation of solution-processed nickel oxide thin-film transistor based on high-k dielectric

    NASA Astrophysics Data System (ADS)

    Liu, Ao; Liu, Guoxia; Zhu, Huihui; Shin, Byoungchul; Fortunato, Elvira; Martins, Rodrigo; Shan, Fukai

    2016-06-01

    Solution-processed p-type oxide semiconductors have recently attracted increasing interests for the applications in low-cost optoelectronic devices and low-power consumption complementary metal-oxide-semiconductor circuits. In this work, p-type nickel oxide (NiOx) thin films were prepared using low-temperature solution process and integrated as the channel layer in thin-film transistors (TFTs). The electrical properties of NiOx TFTs, together with the characteristics of NiOx thin films, were systematically investigated as a function of annealing temperature. By introducing aqueous high-k aluminum oxide (Al2O3) gate dielectric, the electrical performance of NiOx TFT was improved significantly compared with those based on SiO2 dielectric. Particularly, the hole mobility was found to be 60 times enhancement, quantitatively from 0.07 to 4.4 cm2/V s, which is mainly beneficial from the high areal capacitance of the Al2O3 dielectric and high-quality NiOx/Al2O3 interface. This simple solution-based method for producing p-type oxide TFTs is promising for next-generation oxide-based electronic applications.

  7. Thin-film dielectric elastomer sensors to measure the contraction force of smooth muscle cells

    NASA Astrophysics Data System (ADS)

    Araromi, O.; Poulin, A.; Rosset, S.; Favre, M.; Giazzon, M.; Martin-Olmos, C.; Liley, M.; Shea, H.

    2015-04-01

    The development of thin-film dielectric elastomer strain sensors for the characterization of smooth muscle cell (SMC) contraction is presented here. Smooth muscle disorders are an integral part of diseases such as asthma and emphysema. Analytical tools enabling the characterization of SMC function i.e. contractile force and strain, in a low-cost and highly parallelized manner are necessary for toxicology screening and for the development of new and more effective drugs. The main challenge with the design of such tools is the accurate measurement of the extremely low contractile cell forces expected as a result of SMC monolayer contraction (as low as ~ 100 μN). Our approach utilizes ultrathin (~5 μm) and soft elastomer membranes patterned with elastomer-carbon composite electrodes, onto which the SMCs are cultured. The cell contraction induces an in-plane strain in the elastomer membrane, predicted to be in the order 1 %, which can be measured via the change in the membrane capacitance. The cell force can subsequently be deduced knowing the mechanical properties of the elastomer membrane. We discuss the materials and fabrication methods selected for our system and present preliminary results indicating their biocompatibility. We fabricate functional capacitive senor prototypes with good signal stability over the several hours (~ 0.5% variation). We succeed in measuring in-plane strains of 1 % with our fabricated devices with good repeatability and signal to noise ratio.

  8. Diffusion barrier properties of single- and multilayered quasi-amorphous tantalum nitride thin films against copper penetration

    NASA Astrophysics Data System (ADS)

    Chen, G. S.; Chen, S. T.

    2000-06-01

    Tantalum-related thin films containing different amounts of nitrogen are sputter deposited at different argon-to-nitrogen flow rate ratios on (100) silicon substrates. Using x-ray diffractometry, transmission electron microscopy, composition and resistivity analyses, and bending-beam stress measurement technique, this work examines the impact of varying the nitrogen flow rate, particularly on the crystal structure, composition, resistivity, and residual intrinsic stress of the deposited Ta2N thin films. With an adequate amount of controlled, reactive nitrogen in the sputtering gas, thin films of the tantalum nitride of nominal formula Ta2N are predominantly amorphous and can exist over a range of nitrogen concentrations slightly deviated from stoichiometry. The single-layered quasi-amorphous Ta2N (a-Ta2N) thin films yield intrinsic compressive stresses in the range 3-5 GPa. In addition, the use of the 40-nm-thick a-Ta2N thin films with different nitrogen atomic concentrations (33% and 36%) and layering designs as diffusion barriers between silicon and copper are also evaluated. When subjected to high-temperature annealing, the single-layered a-Ta2N barrier layers degrade primarily by an amorphous-to-crystalline transition of the barrier layers. Crystallization of the single-layered stoichiometric a-Ta2N (Ta67N33) diffusion barriers occurs at temperatures as low as 450 °C. Doing so allows copper to preferentially penetrate through the grain boundaries or thermal-induced microcracks of the crystallized barriers and react with silicon, sequentially forming {111}-facetted pyramidal Cu3Si precipitates and TaSi2 Overdoping nitrogen into the amorphous matrix can dramatically increase the crystallization temperature to 600 °C. This temperature increase slows down the inward diffusion of copper and delays the formation of both silicides. The nitrogen overdoped Ta2N (Ta64N36) diffusion barriers can thus be significantly enhanced so as to yield a failure temperature 100

  9. Mechanical property changes in porous low-k dielectric thin films during processing

    NASA Astrophysics Data System (ADS)

    Stan, G.; Gates, R. S.; Kavuri, P.; Torres, J.; Michalak, D.; Ege, C.; Bielefeld, J.; King, S. W.

    2014-10-01

    The design of future generations of Cu-low-k dielectric interconnects with reduced electronic crosstalk often requires engineering materials with an optimal trade off between their dielectric constant and elastic modulus. This is because the benefits associated with the reduction of the dielectric constant by increasing the porosity of materials, for example, can adversely affect their mechanical integrity during processing. By using load-dependent contact-resonance atomic force microscopy, the changes in the elastic modulus of low-k dielectric materials due to processing were accurately measured. These changes were linked to alterations sustained by the structure of low-k dielectric films during processing. A two-phase model was used for quantitative assessments of the elastic modulus changes undergone by the organosilicate skeleton of the structure of porous and pore-filled dielectrics.

  10. Mechanical property changes in porous low-k dielectric thin films during processing

    SciTech Connect

    Stan, G. Gates, R. S.; Kavuri, P.; Torres, J.; Michalak, D.; Ege, C.; Bielefeld, J.; King, S. W.

    2014-10-13

    The design of future generations of Cu-low-k dielectric interconnects with reduced electronic crosstalk often requires engineering materials with an optimal trade off between their dielectric constant and elastic modulus. This is because the benefits associated with the reduction of the dielectric constant by increasing the porosity of materials, for example, can adversely affect their mechanical integrity during processing. By using load-dependent contact-resonance atomic force microscopy, the changes in the elastic modulus of low-k dielectric materials due to processing were accurately measured. These changes were linked to alterations sustained by the structure of low-k dielectric films during processing. A two-phase model was used for quantitative assessments of the elastic modulus changes undergone by the organosilicate skeleton of the structure of porous and pore-filled dielectrics.

  11. Room-temperature magneto-dielectric response in multiferroic ZnFe2O4/PMN-PT bilayer thin films

    NASA Astrophysics Data System (ADS)

    Garg, T.; Kulkarni, A. R.; Venkataramani, N.

    2016-08-01

    The magneto-dielectric response in multiferroic ZnFe2O4/PMN-PT bilayer thin films prepared on a glass substrate using RF magnetron sputtering has been investigated in this work. PMN-PT thin films (i.e. PMN-PT/LCMO/Pt/Ti/glass) deposited on glass were used as a substrate for deposition of ZnFe2O4 thin films. ZnFe2O4 thin films were annealed ex situ at different temperatures. Structural, magnetic, ferroelectric, dielectric and magneto-dielectric studies were carried out on these multiferroic bilayer thin films. Structural studies revealed the presence of each layer in its respective single phase. Magnetic and ferroelectric studies revealed the ferromagnetic and ferroelectric behaviors of these bilayers. To quantify the magnetoelectric coupling, the dielectric constant of the bilayer was measured at room temperature as a function of frequency with and without the applied magnetic field. The magneto-dielectric response MD(%) was calculated by finding the relative change in dielectric constant at 1 kHz as a percentage. The observed MD response was correlated with magnetization of the ferrite layer. An MD response of 2.60% was found for a bilayer film annealed at 350 °C. At this particular annealing temperature, the ZnFe2O4 layer also has the highest saturation magnetization of 1900 G.

  12. Maximizing the dielectric response of molecular thin films via quantum chemical design.

    PubMed

    Heitzer, Henry M; Marks, Tobin J; Ratner, Mark A

    2014-12-23

    Developing high-capacitance organic gate dielectrics is critical for advances in electronic circuitry based on unconventional semiconductors. While high-dielectric constant molecular substances are known, the mechanism of dielectric response and the fundamental chemical design principles are not well understood. Using a plane-wave density functional theory formalism, we show that it is possible to map the atomic-scale dielectric profiles of molecule-based materials while capturing important bulk characteristics. For molecular films, this approach reveals how basic materials properties such as surface coverage density, molecular tilt angle, and π-system planarity can dramatically influence dielectric response. Additionally, relatively modest molecular backbone and substituent variations can be employed to substantially enhance film dielectric response. For dense surface coverages and proper molecular alignment, conjugated hydrocarbon chains can achieve dielectric constants of >8.0, more than 3 times that of analogous saturated chains, ∼2.5. However, this conjugation-related dielectric enhancement depends on proper molecular orientation and planarization, with enhancements up to 60% for proper molecular alignment with the applied field and an additional 30% for conformations such as coplanarity in extended π-systems. Conjugation length is not the only determinant of dielectric response, and appended polarizable high-Z substituents can increase molecular film response more than 2-fold, affording estimated capacitances of >9.0 μF/cm2. However, in large π-systems, polar substituent effects are substantially attenuated.

  13. Sixfold ring clustering in sp{sup 2}-dominated carbon and carbon nitride thin films: A Raman spectroscopy study

    SciTech Connect

    Abrasonis, G.; Gago, R.; Vinnichenko, M.; Kreissig, U.; Kolitsch, A.; Moeller, W.

    2006-03-15

    The atomic arrangement in sp{sup 2}-dominated carbon (C) and carbon nitride (CN{sub x}) thin films has been studied by Raman spectroscopy as a function of substrate temperature and, in the case of CN{sub x}, different N incorporation routes (growth methods). In this way, materials composing graphitelike, fullerenelike (FL), and paracyanogenlike structures have been compared. The results show that each type of arrangement results in a characteristic set of the Raman spectra parameters, which describe the degree of aromatic clustering, bond length, and angle distortion and order in sixfold structures. In the case of C films, the atomic structure evolves with substrate temperature from a disordered network to nanocrystalline planar graphitic configurations, with a progressive promotion in size and ordering of sixfold ring clusters. Nitrogen incorporation favors the promotion of sixfold rings in highly disordered networks produced at low temperatures, but precludes the formation of extended graphiticlike clusters at elevated substrate temperatures (>700 K). In the latter case, N introduces a high degree of disorder in sixfold ring clusters and enhances the formation of a FL microstructure. The formation and growth of aromatic clusters are discussed in terms of substrate temperature, N incorporation, growth rate, film-forming sources, and concurrent bombardment by hyperthermal particles during growth.

  14. Effect of process parameters on the mechanical properties of carbon nitride thin films synthesized by plasma assisted pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Tabbal, M.; Mérel, P.; Chaker, M.

    We present an investigation of the effect of the process parameters, namely deposition pressure and laser intensity, on the growth and mechanical properties of carbon nitride (CNx) thin films synthesized by plasma assisted pulsed laser deposition. Deposition at high remote plasma pressure (200 mTorr) enhances both growth rate and nitrogen incorporation (up to 40 at.%), but nano-indentation measurements indicate that these films are very soft and have poor mechanical properties. At low remote plasma pressure (0.5 mTorr), the nitrogen content varies from 24 to 16 at.% with increasing laser intensity as the films become much harder and more elastic, with hardness and Young's modulus values reaching 24 GPa and 230 GPa, respectively. These effects are explained in terms of a thermalization of the laser plasma at 200 mTorr and indicate that plasma activation of nitrogen does not provide any particular benefit to the film properties when deposition is performed at high pressure. However, at low pressure, the benefit of plasma activation is evidenced through enhanced nitrogen incorporation in the films while preserving the highly energetic species in the ablation plume. Such conditions lead to the synthesis, at room temperature, of hard and elastic films having properties close to those of fullerene-like CNx.

  15. Sub-picowatt resolution calorimetry with niobium nitride thin-film thermometer

    NASA Astrophysics Data System (ADS)

    Dechaumphai, Edward; Chen, Renkun

    2014-09-01

    High-resolution calorimetry has many important applications such as probing nanoscale thermal transport and studying the thermodynamics of biological and chemical systems. In this work, we demonstrated a calorimeter with an unprecedentedly high resolution at room temperature using a high-performance resistive thermometry material, niobium nitride (NbNx). Based on a theoretical analysis, we first showed that the heat flux resolution of a resistive-thermometry based calorimeter depends on the parasitic thermal conductance of the device and the temperature coefficient of resistance (TCR) of the thermometer, when the noise is limited by the Johnson noise. Based on this analysis, we then developed a calorimeter using NbNx as the thermometry material because it possesses both high TCR (˜0.67%/K) and a low thermal conductivity (k ˜ 1.1 W/m K). This calorimeter, when used with the modulated heating scheme, demonstrated an unprecedentedly high power resolution of 0.26 pW at room temperature. In addition, NbNx based resistive thermometry can also be extended to cryogenic temperature, where the TCR is shown to be significantly higher.

  16. Sub-picowatt resolution calorimetry with niobium nitride thin-film thermometer

    SciTech Connect

    Dechaumphai, Edward; Chen, Renkun

    2014-09-15

    High-resolution calorimetry has many important applications such as probing nanoscale thermal transport and studying the thermodynamics of biological and chemical systems. In this work, we demonstrated a calorimeter with an unprecedentedly high resolution at room temperature using a high-performance resistive thermometry material, niobium nitride (NbN{sub x}). Based on a theoretical analysis, we first showed that the heat flux resolution of a resistive-thermometry based calorimeter depends on the parasitic thermal conductance of the device and the temperature coefficient of resistance (TCR) of the thermometer, when the noise is limited by the Johnson noise. Based on this analysis, we then developed a calorimeter using NbN{sub x} as the thermometry material because it possesses both high TCR (∼0.67%/K) and a low thermal conductivity (k ∼ 1.1 W/m K). This calorimeter, when used with the modulated heating scheme, demonstrated an unprecedentedly high power resolution of 0.26 pW at room temperature. In addition, NbN{sub x} based resistive thermometry can also be extended to cryogenic temperature, where the TCR is shown to be significantly higher.

  17. Ultra-thin superconducting film coated silicon nitride nanowire resonators for low-temperature applications

    NASA Astrophysics Data System (ADS)

    Sebastian, Abhilash; Zhelev, Nikolay; de Alba, Roberto; Parpia, Jeevak

    We demonstrate fabrication of high stress silicon nitride nanowire resonators with a thickness and width of less than 50 nm intended to be used as probes for the study of superfluid 3He. The resonators are fabricated as doubly-clamped wires/beams using a combination of electron-beam lithography and wet/dry etching techniques. We demonstrate the ability to suspend (over a trench of depth ~8 µm) wires with a cross section as small as 30 nm, covered with a 20 nm superconducting film, and having lengths up to 50 µm. Room temperature resonance measurements were carried out by driving the devices using a piezo stage and detecting the motion using an optical interferometer. The results show that metalizing nano-mechanical resonators not only affects their resonant frequencies but significantly reduce their quality factor (Q). The devices are parametrically pumped by modulating the system at twice its fundamental resonant frequency, which results in observed amplification of the signal. The wires show self-oscillation with increasing modulation strength. The fabricated nanowire resonators are intended to be immersed in the superfluid 3He. By tracking the resonant frequency and the Q of the various modes of the wire versus temperature, we aim to probe the superfluid gap structure.

  18. Localization and pair breaking parameter in superconducting molybdenum nitride thin films.

    PubMed

    Tsuneoka, Takuya; Makise, Kazumasa; Maeda, Sho; Shinozaki, Bunju; Ichikawa, Fusao

    2017-01-11

    We have investigated the superconductor-insulator transition in molybdenum nitride films prepared by deposition onto MgO substrates. It is indicated that the T c depression from [Formula: see text] for thick films with increase of the normal state sheet resistance [Formula: see text] was well explained by the Finkel'stein formula from the localization theory. Present analysis suggests that the superconducting-insulator transition occurs at a critical sheet resistance [Formula: see text]. It is found that the [Formula: see text] above [Formula: see text] shows different characteristics of [Formula: see text] and [Formula: see text] in the regions [Formula: see text] and [Formula: see text], respectively, where [Formula: see text] is the classical residual resistance and A is a constant. The excess conductance [Formula: see text] due to thermal fluctuation has been analyzed by the sum of the Aslamazov-Larkin and Maki-Thompson correction terms with use of the pair breaking parameter [Formula: see text] in the latter term. The sum agrees well with the data, although the experimental results of the [Formula: see text] dependence of [Formula: see text], that is, [Formula: see text] shows the disagreement with a linear relation [Formula: see text] derived from the localization theory.

  19. Thin film deposition at atmospheric pressure using dielectric barrier discharges: Advances on three-dimensional porous substrates and functional coatings

    NASA Astrophysics Data System (ADS)

    Fanelli, Fiorenza; Bosso, Piera; Mastrangelo, Anna Maria; Fracassi, Francesco

    2016-07-01

    Surface processing of materials by atmospheric pressure dielectric barrier discharges (DBDs) has experienced significant growth in recent years. Considerable research efforts have been directed for instance to develop a large variety of processes which exploit different DBD electrode geometries for the direct and remote deposition of thin films from precursors in gas, vapor and aerosol form. This article briefly reviews our recent progress in thin film deposition by DBDs with particular focus on process optimization. The following examples are provided: (i) the plasma-enhanced chemical vapor deposition of thin films on an open-cell foam accomplished by igniting the DBD throughout the entire three-dimensional (3D) porous structure of the substrate, (ii) the preparation of hybrid organic/inorganic nanocomposite coatings using an aerosol-assisted process, (iii) the DBD jet deposition of coatings containing carboxylic acid groups and the improvement of their chemical and morphological stability upon immersion in water.

  20. The Dielectric Breakdown Model applied to explain various morphologies of deposited metallic structures in thin gap metal electro-deposition

    NASA Astrophysics Data System (ADS)

    Chowdhury, Aditya; Dutta, Dibakar

    2015-06-01

    The phenomenon of metal electro-deposition in thin-gap geometry leads to very interesting and diverse two dimensional morphologies. This varies from dense ramified growth to thin dendritic projections. In this paper, we have proposed a stochastic model that incorporates such diversity. We carried out thin-gap electro-deposition of Copper and Zinc with varying electrolytic concentrations. A well known model, that until this work was used to explain dielectric breakdown patterns, was employed to explain the variation in deposition morphology with concentration. The sole parameter in the model was varied and the numerically obtained patterns was seen to correlate well with those obtained from electro-deposition. A linear relationship between the parameter and molar concentration was established. The established relationship was then analysed and interpreted.

  1. Optical, Dielectric Characterization and Impedance Spectroscopy of Ni-Substituted MgTiO3 Thin Films

    NASA Astrophysics Data System (ADS)

    Gogoi, Pallabi; Srinivas, P.; Sharma, Pramod; Pamu, D.

    2016-02-01

    We report the effects of oxygen mixing percentage (OMP) and annealing temperature on surface morphology, optical, dielectric and electrical properties of (Mg0.95Ni0.05)TiO3 (MNT) thin films deposited onto amorphous SiO2 and platinized silicon (Pt/TiO2/SiO2/Si) substrates by radio frequency (RF) magnetron sputtering. The annealed films exhibited the highest refractive index, 2.05, at 600 nm with an optical bandgap value of 4.33 eV. The metal-insulator-metal (MIM) capacitors of the MNT thin films were fabricated under different OMPs and the dielectric properties were analyzed by using Maxwell-Wagner two-layer theory and Koop's phenomenological theory. MNT films prepared under 50% OMP displayed the highest dielectric constant (11.21) and minimum loss tangent (0.0114) at 1 MHz. The impedance spectroscopy of the films deposited under 50% OMP has been studied. The Nyquist plots of MNT films revealed two semi-circular arcs and is explained on the basis of an equivalent circuit model. The frequency-dependent alternative current (AC) conductivity followed the Jonscher's power law. The activation energies are calculated using the Arrhenius relationship. The hopping frequency of the charged species was calculated, and the correlation between AC and direct current (DC) conduction mechanisms established in accordance with the Barton-Nakajima-Namikawa (BNN) relationship.

  2. Tunability of the dielectric function of heavily doped germanium thin films for mid-infrared plasmonics

    NASA Astrophysics Data System (ADS)

    Frigerio, Jacopo; Ballabio, Andrea; Isella, Giovanni; Sakat, Emilie; Pellegrini, Giovanni; Biagioni, Paolo; Bollani, Monica; Napolitani, Enrico; Manganelli, Costanza; Virgilio, Michele; Grupp, Alexander; Fischer, Marco P.; Brida, Daniele; Gallacher, Kevin; Paul, Douglas J.; Baldassarre, Leonetta; Calvani, Paolo; Giliberti, Valeria; Nucara, Alessandro; Ortolani, Michele

    2016-08-01

    Heavily doped semiconductor thin films are very promising for application in mid-infrared plasmonic devices because the real part of their dielectric function is negative and broadly tunable in the 5 to 50 μ m wavelength range at least. In this work, we investigate the electrodynamics of heavily n -type-doped germanium epilayers at infrared frequencies beyond the assumptions of the Drude model. The films are grown on silicon and germanium substrates, are in situ doped with phosphorous in the 1017 to 1019 cm-3 range, then screened plasma frequencies in the 100 to 1200 cm-1 range were observed. We employ infrared spectroscopy, pump-probe spectroscopy, and dc transport measurements to determine the tunability of the plasma frequency. Although no plasmonic structures have been realized in this work, we derive estimates of the decay time of mid-infrared plasmons and of their figures of merit for field confinement and for surface plasmon propagation. The average electron scattering rate increases almost linearly with excitation frequency, in agreement with quantum calculations based on a model of the ellipsoidal Fermi surface at the conduction band minimum of germanium accounting for electron scattering with optical phonons and charged impurities. Instead, we found weak dependence of plasmon losses on neutral impurity density. In films where a transient plasma was generated by optical pumping, we found significant dependence of the energy relaxation times in the few-picosecond range on the static doping level of the film, confirming the key but indirect role played by charged impurities in energy relaxation. Our results indicate that underdamped mid-infrared plasma oscillations are attained in n -type-doped germanium at room temperature.

  3. Localization and pair breaking parameter in superconducting molybdenum nitride thin films

    NASA Astrophysics Data System (ADS)

    Tsuneoka, Takuya; Makise, Kazumasa; Maeda, Sho; Shinozaki, Bunju; Ichikawa, Fusao

    2017-01-01

    We have investigated the superconductor-insulator transition in molybdenum nitride films prepared by deposition onto MgO substrates. It is indicated that the T c depression from ≈ 6.6 \\text{K} for thick films with increase of the normal state sheet resistance R\\text{sq}\\text{N} was well explained by the Finkel’stein formula from the localization theory. Present analysis suggests that the superconducting-insulator transition occurs at a critical sheet resistance {{R}\\text{c}}≈ 2 \\text{k} Ω . It is found that the {{R}\\text{sq}}(T) above {{R}\\text{c}} shows different characteristics of {{R}\\text{sq}}(T)={{R}\\text{sq,0}}-A\\ln T and {{R}\\text{sq}}(T)\\propto \\exp ≤ft[{≤ft({{T}0}/T\\right)}1/2}\\right] in the regions {{R}\\text{c}}\\text{sq}\\text{N}<{{R}\\text{Q}}=h/4{{e}2}≈ 6.45 \\text{k} Ω and R\\text{sq}\\text{N}>{{R}\\text{Q}} , respectively, where {{R}\\text{sq,0}} is the classical residual resistance and A is a constant. The excess conductance {{σ\\prime}{}(T) due to thermal fluctuation has been analyzed by the sum of the Aslamazov-Larkin and Maki-Thompson correction terms with use of the pair breaking parameter δ in the latter term. The sum agrees well with the data, although the experimental results of the R\\text{sq}\\text{N} dependence of δ , that is, δ \\propto {{≤ft(R\\text{sq}\\text{N}\\right)}≈ 1.7} shows the disagreement with a linear relation δ \\propto ≤ft(R\\text{sq}\\text{N}\\right) derived from the localization theory.

  4. Cyanoresin, cyanoresin/cellulose triacetate blends for thin film, dielectric capacitors

    NASA Technical Reports Server (NTRS)

    Yen, Shiao-Ping S. (Inventor); Lewis, Carol R. (Inventor); Cygan, Peter J. (Inventor); Jow, T. Richard (Inventor)

    1996-01-01

    Non brittle dielectric films are formed by blending a cyanoresin such as cyanoethyl, hydroxyethyl cellulose (CRE) with a compatible, more crystalline resin such as cellulose triacetate. The electrical breakdown strength of the blend is increased by orienting the films by uniaxial or biaxial stretching. Blends of high molecular weight CRE with high molecular weight cyanoethyl cellulose (CRC) provide films with high dielectric constants.

  5. Cyanoresin, cyanoresin/cellulose triacetate blends for thin film, dielectric capacitors

    NASA Technical Reports Server (NTRS)

    Yen, Shiao-Ping (Inventor); Jow, T. Richard (Inventor)

    1993-01-01

    Non-brittle dielectric films are formed by blending a cyanoresin such as cyanoethyl, hydroxyethyl cellulose (CRE) with a compatible, more crystalline resin such as cellulose triacetate. The electrical breakdown strength of the blend is increased by orienting the films by uniaxial or biaxial stretching. Blends of high molecular weight CRE with high molecular weight cyanoethyl cellulose (CRC) provide films with high dielectric constants.

  6. Effect of thermal stresses on the dielectric properties of strontium titanate thin films

    NASA Astrophysics Data System (ADS)

    Zhang, J.; Weiss, C. V.; Alpay, S. P.

    2011-07-01

    We develop a quantitative thermodynamic model to understand the role of thermal stresses on the dielectric permittivity and tunability of (001)-textured polycrystalline monodomain strontium titanate (SrTiO3) films. This methodology is used to compute the dielectric constant and tunability of SrTiO3 films on Si, c-sapphire, LaAlO3, and MgO substrates. Results show that dielectric properties of SrTiO3 depend strongly on the growth/processing temperature TG. For substrates such as MgO that induce compressive in-plane thermal stresses, the dielectric response of SrTiO3 is enhanced. However, for SrTiO3 films on IC-compatible substrates (Si and c-sapphire), thermal stresses can significantly degrade the dielectric permittivity and tunability.

  7. Highly Bendable In-Ga-ZnO Thin Film Transistors by Using a Thermally Stable Organic Dielectric Layer

    PubMed Central

    Kumaresan, Yogeenth; Pak, Yusin; Lim, Namsoo; kim, Yonghun; Park, Min-Ji; Yoon, Sung-Min; Youn, Hyoc-Min; Lee, Heon; Lee, Byoung Hun; Jung, Gun Young

    2016-01-01

    Flexible In-Ga-ZnO (IGZO) thin film transistor (TFT) on a polyimide substrate is produced by employing a thermally stable SA7 organic material as the multi-functional barrier and dielectric layers. The IGZO channel layer was sputtered at Ar:O2 gas flow rate of 100:1 sccm and the fabricated TFT exhibited excellent transistor performances with a mobility of 15.67 cm2/Vs, a threshold voltage of 6.4 V and an on/off current ratio of 4.5 × 105. Further, high mechanical stability was achieved by the use of organic/inorganic stacking of dielectric and channel layers. Thus, the IGZO transistor endured unprecedented bending strain up to 3.33% at a bending radius of 1.5 mm with no significant degradation in transistor performances along with a superior reliability up to 1000 cycles. PMID:27876893

  8. In-situ integrated processing and characterization of thin films of high temperature superconductors, dielectrics and semiconductors by MOCVD

    NASA Technical Reports Server (NTRS)

    Singh, R.; Sinha, S.; Hsu, N. J.; Thakur, R. P. S.; Chou, P.; Kumar, A.; Narayan, J.

    1990-01-01

    In this strategy of depositing the basic building blocks of superconductors, semiconductors, and dielectric having common elements, researchers deposited superconducting films of Y-Ba-Cu-O, semiconductor films of Cu2O, and dielectric films of BaF2 and Y2O3 by metal oxide chemical vapor deposition (MOCVD). By switching source materials entering the chamber, and by using direct writting capability, complex device structures like three-terminal hybrid semiconductors/superconductors transistors can be fabricated. The Y-Ba-Cu-O superconducting thin films on BaF2/YSZ substrates show a T(sub c) of 80 K and are textured with most of the grains having their c-axis or a-axis perpendicular to the substrate. Electrical characteristics as well as structural characteristics of superconductors and related materials obtained by x-ray defraction, electron microscopy, and energy dispersive x-ray analysis are discussed.

  9. In-situ integrated processing and characterization of thin films of high temperature superconductors, dielectrics and semiconductors by MOCVD

    NASA Astrophysics Data System (ADS)

    Singh, R.; Sinha, S.; Hsu, N. J.; Thakur, R. P. S.; Chou, P.; Kumar, A.; Narayan, J.

    1990-04-01

    In this strategy of depositing the basic building blocks of superconductors, semiconductors, and dielectric having common elements, researchers deposited superconducting films of Y-Ba-Cu-O, semiconductor films of Cu2O, and dielectric films of BaF2 and Y2O3 by metal oxide chemical vapor deposition (MOCVD). By switching source materials entering the chamber, and by using direct writting capability, complex device structures like three-terminal hybrid semiconductors/superconductors transistors can be fabricated. The Y-Ba-Cu-O superconducting thin films on BaF2/YSZ substrates show a T(sub c) of 80 K and are textured with most of the grains having their c-axis or a-axis perpendicular to the substrate. Electrical characteristics as well as structural characteristics of superconductors and related materials obtained by x-ray defraction, electron microscopy, and energy dispersive x-ray analysis are discussed.

  10. High-density carrier-accumulated and electrically stable oxide thin-film transistors from ion-gel gate dielectric

    PubMed Central

    Fujii, Mami N.; Ishikawa, Yasuaki; Miwa, Kazumoto; Okada, Hiromi; Uraoka, Yukiharu; Ono, Shimpei

    2015-01-01

    The use of indium–gallium–zinc oxide (IGZO) has paved the way for high-resolution uniform displays or integrated circuits with transparent and flexible devices. However, achieving highly reliable devices that use IGZO for low-temperature processes remains a technological challenge. We propose the use of IGZO thin-film transistors (TFTs) with an ionic-liquid gate dielectric in order to achieve high-density carrier-accumulated IGZO TFTs with high reliability, and we discuss a distinctive mechanism for the degradation of this organic–inorganic hybrid device under long-term electrical stress. Our results demonstrated that an ionic liquid or gel gate dielectric provides highly reliable and low-voltage operation with IGZO TFTs. Furthermore, high-density carrier accumulation helps improve the TFT characteristics and reliability, and it is highly relevant to the electronic phase control of oxide materials and the degradation mechanism for organic–inorganic hybrid devices. PMID:26677773

  11. In-situ integrated processing and characterization of thin films of high temperature superconductors, dielectrics and semiconductors by MOCVD

    NASA Technical Reports Server (NTRS)

    Singh, R.; Sinha, S.; Hsu, N. J.; Thakur, R. P. S.; Chou, P.; Kumar, A.; Narayan, J.

    1991-01-01

    In this strategy of depositing the basic building blocks of superconductors, semiconductors, and dielectrics having common elements, researchers deposited superconducting films of Y-Ba-Cu-O, semiconductor films of Cu2O, and dielectric films of BaF2 and Y2O3 by metal oxide chemical vapor deposition (MOCVD). By switching source materials entering the chamber, and by using direct writing capability, complex device structures like three terminal hybrid semiconductor/superconductor transistors can be fabricated. The Y-Ba-Cu-O superconducting thin films on BaF2/YSZ substrates show a T(sub c) of 80 K and are textured with most of the grains having their c-axis or a-axis perpendicular to the substrate. Electrical characteristics as well as structural characteristics of superconductors and related materials obtained by x-ray deffraction, electron microscopy, and energy dispersive x-ray analysis are discussed.

  12. Performance improvement in polymeric thin film transistors using chemically modified both silver bottom contacts and dielectric surfaces

    NASA Astrophysics Data System (ADS)

    Xie, Ying-Tao; Ouyang, Shi-Hong; Wang, Dong-Ping; Zhu, Da-Long; Xu, Xin; Tan, Te; Fong, Hon-Hang

    2015-09-01

    An efficient interface modification is introduced to improve the performance of polymeric thin film transistors. This efficient interface modification is first achieved by 4-fluorothiophenol (4-FTP) self-assembled monolayers (SAM) to chemically treat the silver source-drain (S/D) contacts while the silicon oxide (SiO2) dielectric interface is further primed by either hexamethyldisilazane (HMDS) or octyltrichlorosilane (OTS-C8). Results show that contact resistance is the dominant factor that limits the field effect mobility of the PTDPPTFT4 transistors. With proper surface modification applied to both the dielectric surface and the bottom contacts, the field effect mobilities of the bottom-gate bottom-contact PTDPPTFT4 transistors were significantly improved from 0.15 cm2·V-1·s-1 to 0.91 cm2·V-1·s-1. Project supported by the National Basic Research Program of China (Grant No. 2013CB328803).

  13. High-density carrier-accumulated and electrically stable oxide thin-film transistors from ion-gel gate dielectric

    NASA Astrophysics Data System (ADS)

    Fujii, Mami N.; Ishikawa, Yasuaki; Miwa, Kazumoto; Okada, Hiromi; Uraoka, Yukiharu; Ono, Shimpei

    2015-12-01

    The use of indium-gallium-zinc oxide (IGZO) has paved the way for high-resolution uniform displays or integrated circuits with transparent and flexible devices. However, achieving highly reliable devices that use IGZO for low-temperature processes remains a technological challenge. We propose the use of IGZO thin-film transistors (TFTs) with an ionic-liquid gate dielectric in order to achieve high-density carrier-accumulated IGZO TFTs with high reliability, and we discuss a distinctive mechanism for the degradation of this organic-inorganic hybrid device under long-term electrical stress. Our results demonstrated that an ionic liquid or gel gate dielectric provides highly reliable and low-voltage operation with IGZO TFTs. Furthermore, high-density carrier accumulation helps improve the TFT characteristics and reliability, and it is highly relevant to the electronic phase control of oxide materials and the degradation mechanism for organic-inorganic hybrid devices.

  14. Highly Bendable In-Ga-ZnO Thin Film Transistors by Using a Thermally Stable Organic Dielectric Layer

    NASA Astrophysics Data System (ADS)

    Kumaresan, Yogeenth; Pak, Yusin; Lim, Namsoo; Kim, Yonghun; Park, Min-Ji; Yoon, Sung-Min; Youn, Hyoc-Min; Lee, Heon; Lee, Byoung Hun; Jung, Gun Young

    2016-11-01

    Flexible In-Ga-ZnO (IGZO) thin film transistor (TFT) on a polyimide substrate is produced by employing a thermally stable SA7 organic material as the multi-functional barrier and dielectric layers. The IGZO channel layer was sputtered at Ar:O2 gas flow rate of 100:1 sccm and the fabricated TFT exhibited excellent transistor performances with a mobility of 15.67 cm2/Vs, a threshold voltage of 6.4 V and an on/off current ratio of 4.5 × 105. Further, high mechanical stability was achieved by the use of organic/inorganic stacking of dielectric and channel layers. Thus, the IGZO transistor endured unprecedented bending strain up to 3.33% at a bending radius of 1.5 mm with no significant degradation in transistor performances along with a superior reliability up to 1000 cycles.

  15. Polarization and Dielectric Study of Methylammonium Lead Iodide Thin Film to Reveal its Nonferroelectric Nature under Solar Cell Operating Conditions

    SciTech Connect

    Hoque, Md Nadim Ferdous; Yang, Mengjin; Li, Zhen; Islam, Nazifah; Pan, Xuan; Zhu, Kai; Fan, Zhaoyang

    2016-07-08

    Researchers have debated whether methylammonium lead iodide (MAPbI3), with a perovskite crystal structure, is ferroelectric and therefore contributes to the current--voltage hysteresis commonly observed in hybrid perovskite solar cells (PSCs). We thoroughly investigated temperature-dependent polarization, dielectric, and impedance spectroscopies, and we found no evidence of ferroelectric effect in a MAPbI3 thin film at normal operating conditions. Therefore, the effect does not contribute to the hysteresis in PSCs, whereas the large component of ionic migration observed may play a critical role. Our temperature-based polarization and dielectric studies find that MAPbI3 exhibits different electrical behaviors below and above ca. 45 degrees C, suggesting a phase transition around this temperature. In particular, we report the activation energies of ionic migration for the two phases and temperature-dependent permittivity of MAPbI3. This study contributes to the understanding of the material properties and device performance of hybrid perovskites.

  16. In-situ observation of self-cleansing phenomena during ultra-high vacuum anneal of transition metal nitride thin films: Prospects for non-destructive photoelectron spectroscopy

    NASA Astrophysics Data System (ADS)

    Greczynski, G.; Hultman, L.

    2016-11-01

    Self-cleansing of transition metal nitrides is discovered to take place during ultra-high vacuum annealing of TiN, NbN, and VN thin films. Native oxide layers from air exposure disappear after isothermal anneal at 1000 °C. Also, for TiN, the Ti 2p and N 1s X-ray photoelectron spectra (XPS) recorded after the anneal are identical to those obtained from in-situ grown and analyzed epitaxial TiN(001). These unexpected effects are explained by oxide decomposition in combination with N-replenishing of the nitride during recrystallization. The finding opens up new possibilities for true bonding assignments through non-destructive XPS analyses, thus avoiding artefacts from Ar etching.

  17. Comprehensive dielectric performance of bismuth acceptor doped BaTiO3 based nanocrystal thin film capacitors

    SciTech Connect

    Liu, SY; Zhang, HN; Sviridov, L; Huang, LM; Liu, XH; Samson, J; Akins, D; Li, J; O'Brien, S

    2012-11-07

    We present a novel approach to preparing bismuth acceptor doped barium titanate nanocrystal formulations that can be deposited in conjunction with polymers in order to prepare a thin film nanocomposite dielectric that exhibits desirable capacitor characteristics. Exploring the limits of dielectric function in nanocomposites is an important avenue of materials research, while paying strict attention to the overall device quality, namely permittivity, loss and equivalent series resistance (ESR). Pushing capacitor function to higher frequencies, a desirable goal from an electrical engineering point of view, presents a new set of challenges in terms of minimizing interfacial, space charge and polarization effects within the dielectric. We show the ability to synthesize BaTi0.96Bi0.04O3 or BaTi0.97Bi0.03O3 depending on nominal molar concentrations of bismuth at the onset. The low temperature solvothermal route allows for substitution at the titanium site (strongly supported by Rietveld and Raman analysis). Characterization is performed by XRD with Rietveld refinement, Raman Spectroscopy, SEM and HRTEM. A mechanism is proposed for bismuth acceptor substitution, based on the chemical reaction of the alkoxy-metal precursors involving nucleophilic addition. Dielectric analysis of the nanocrystal thin films is performed by preparing nanocrystal/PVP 2-2 nanocomposites (no annealing) and comparing BaTi0.96Bi0.04O3 and BaTi0.97Bi0.03O3 with undoped BaTiO3. Improvements of up to 25% in capacitance (permittivity) are observed, with lower loss and dramatically improved ESR, all to very high frequency ranges (>10 MHz).

  18. Dielectric, optical and electric studies on nanocrystalline Ba5Nb4O15 thin films deposited by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Anil Kumar, C.; Pamu, D.

    2015-06-01

    We report the fabrication of nanocrystalline Ag/BNO/Pt/Ti/SiO2/Si thin film capacitors by RF magnetron sputtering with different film thicknesses. The effect of Ba5Nb4O15 (BNO) thickness on structural, microstructural, electrical, optical and dielectric properties is investigated for the first time. BNO sputtering target prepared is by mechanochemical synthesis method to eliminate the subordinate phases. As deposited thin films were X-ray amorphous and crystallinity is induced after annealing at 700 °C. Upon annealing, refractive indices of the films enhanced whereas the bandgap is decreased and are in the range of 1.89-2.16 and 4.07-4.24, respectively. With an increase in thickness, the dielectric properties improved substantially, which is described by the representation of a dead layer connected in series with a bulk region of the BNO film. The extracted values of thickness and dielectric constant for the dead layer found to be 15.21 nm and 37.03, correspondingly. The activation energy of the mobile charge carriers obtained using the Arrhenius relation are found to be 0.254, 0.036 and 0.027 eV, for the films with 150, 250 and 450 nm, respectively. The leakage current density found to decrease with thickness and found to be 2.5 × 10-6 A/cm2 at applied voltage of 50 kV/cm. The J-E characteristics of the BNO films show a combined response of grain, grain boundaries and film-electrode interfaces. It is interesting to note that in the negative electric field region, conduction is ohmic in nature whereas in the positive field region BNO films exhibit both ohmic and the space charge-limited current mechanisms. The achieved dielectric, electrical and optical properties make these films suitable for MIC, CMOS and optoelectronic applications.

  19. Charge trapping/de-trapping in nitrided SiO2 dielectrics and its influence on device reliability

    NASA Astrophysics Data System (ADS)

    Kambour, Kenneth; Hjalmarson, Harold; Nguyen, Duc; Kouhestani, Camron; Devine, Roderick

    2012-02-01

    Field effect devices with insulator gate dielectrics are excellent test vehicles to probe the physics of defects and charge trapping in the insulator/ semiconductor structure. p-channel field effect device reliability under negative bias stressing has been identified to originate from at least two terms: a) charged defect generation at the Si substrate/SiOxNy interface and b) charge trapping at neutral defect pre-cursors in the ``bulk'' of the SiOxNy beyond the interface. Measurements of transistor characteristics enable extraction of the two terms. We report the results of such measurements and demonstrate that short time effects are associated primarily with electric field assisted tunneling of holes from the inversion layer to neutral traps. This is confirmed by bias stressing measurements at different frequencies in the range 1 Hz to 2 MHz. First principles modeling of the tunneling/trapping phenomena is presented. K.Kambour worked under contract FA9453-08-C-0245 with the Air Force Research Laboratory/RVSE. Sandia National Labs is a multi-program laboratory managed and operated by Sandia Corporation, a wholly owned subsidiary of Lockheed Martin Corporation, for the U.S. Department of Energy's National Nuclear Security Administration under contract DE-AC04-94AL85000.

  20. A K-band Frequency Agile Microstrip Bandpass Filter using a Thin Film HTS/Ferroelectric/dielectric Multilayer Configuration

    NASA Technical Reports Server (NTRS)

    Subramanyam, Guru; VanKeuls, Fred; Miranda, Felix A.

    1998-01-01

    We report on YBa2Cu3O(7-delta) (YBCO) thin film/SrTiO3 (STO) thin film K-band tunable bandpass filters on LaAlO3 (LAO) dielectric substrates. The 2 pole filter has a center frequency of 19 GHz and a 4% bandwidth. Tunability is achieved through the non-linear dc electric field dependence of the relative dielectric constant of STO(epsilon(sub rSTO). A large tunability ((Delta)f/f(sub 0) = (f(sub Vmax) - f(sub 0)/f(sub 0), where f(sub 0) is the center frequency of the filter at no bias and f(sub Vmax) is the center frequency of the filter at the maximum applied bias) of greater than 10% was obtained in YBCO/STO/LAO microstrip bandpass filters operating below 77 K. A center frequency shift of 2.3 GHz (i.e., a tunability factor of approximately 15%) was obtained at a 400 V bipolar dc bias, and 30 K, with minimal degradation in the insertion loss of the filter. This paper addresses design, fabrication and testing of tunable filters based on STO ferroelectric thin films. The performance of the YBCO/STO/LAO filters is compared to that of gold/STO/LAO counterparts.

  1. Enhanced dielectric and piezoelectric responses in Zn1-xMgxO thin films near the phase separation boundary

    NASA Astrophysics Data System (ADS)

    Kang, Xiaoyu; Shetty, Smitha; Garten, Lauren; Ihlefeld, Jon F.; Trolier-McKinstry, Susan; Maria, Jon-Paul

    2017-01-01

    Dielectric and piezoelectric properties for Zn1-xMgxO (ZMO) thin films are reported as a function of MgO composition up to and including the phase separation region. Zn1-xMgxO (0.25 ≤ x ≤ 0.5) thin films with c-axis textures were deposited by pulsed laser deposition on platinized sapphire substrates. The films were phase pure wurtzite for MgO concentrations up to 40%; above that limit, a second phase with rocksalt structure evolves with strong {100} texture. With increasing MgO concentration, the out-of-plane (d33,f) and in-plane (e31,f) piezoelectric coefficients increase by 360% and 290%, respectively. The increase in piezoelectric coefficients is accompanied by a 35% increase in relative permittivity. Loss tangent values fall monotonically with increasing MgO concentration, reaching a minimum of 0.001 for x ≥ 0.30, at which point the band gap is reported to be 4 eV. The enhanced piezoelectric response, the large band gap, and the low dielectric loss make Zn1-xMgxO an interesting candidate for thin film piezoelectric devices, and demonstrate that compositional phase transformations provide opportunities for property engineering.

  2. Enhanced dielectric and piezoelectric responses in Zn1-xMgxO thin films near the phase separation boundary

    DOE PAGES

    Kang, Xiaoyu; Shetty, Smitha; Garten, Lauren; ...

    2017-01-23

    Dielectric and piezoelectric properties for Zn1-xMgxO (ZMO) thin films are reported as a function of MgO composition up to and including the phase separation region. Zn1-xMgxO (0.25 ≤ x ≤ 0.5) thin films with c-axis textures were deposited by pulsed laser deposition on platinized sapphire substrates. The films were phase pure wurtzite for MgO concentrations up to 40%; above that limit, a second phase with rocksalt structure evolves with strong {100} texture. With increasing MgO concentration, the out-of-plane (d33,f) and in-plane (e31,f) piezoelectric coefficients increase by 360% and 290%, respectively. The increase in piezoelectric coefficients is accompanied by a 35%more » increase in relative permittivity. Loss tangent values fall monotonically with increasing MgO concentration, reaching a minimum of 0.001 for x ≥ 0.30, at which point the band gap is reported to be 4 eV. As a result, the enhanced piezoelectric response, the large band gap, and the low dielectric loss make Zn1-xMgxO an interesting candidate for thin film piezoelectric devices, and demonstrate that compositional phase transformations provide opportunities for property engineering.« less

  3. Study of Hf-Ti-O Thin Film as High- k Gate Dielectric and Application for ETSOI MOSFETs

    NASA Astrophysics Data System (ADS)

    Chen, Xiaoqiang; Zhao, Hongbin; Xiong, Yuhua; Wei, Feng; Du, Jun; Tang, Zhaoyun; Tang, Bo; Yan, Jiang

    2016-08-01

    This work focused on the metal-oxide-semiconductor (MOS) capacitor and extremely thin silicon-on-insulator (ETSOI) p-type MOS field-effect transistor ( pMOSFET) with laminated hafnium and titanium oxide (Hf-Ti-O) thin films as gate dielectric. The electrical behavior of the MOS capacitor shows that the capacitor with Hf-Ti-O gate dielectric has high performance with low equivalent oxide thickness (EOT, ~0.77 nm), small hysteresis (Δ V fb, ~4 mV), and gate current density of 0.33 A/cm2 at V g = V fb - 1 V. The dominant conduction mechanism of the Hf-Ti-O thin film (25°C to 125°C) was Schottky emission at lower gate voltage (-0.8 V to -0.2 V) and Fowler-Nordheim (F-N) tunneling at higher gate voltage (<-0.8 V). An ETSOI pMOSFET with 25 nm gate length ( L g) also exhibited good electrical properties with switch ratio of 3.2 × 104, appropriate threshold voltage of -0.16 V, maximum transconductance ( G max) of 2.63 mS, drain-induced barrier lowering of 53 mV/V, and subthreshold swing of 65 mV/dec.

  4. Phase and disorder investigations in boron nitride thin films grown by PECVD

    SciTech Connect

    Depero, L.E.; Sangaletti, L.; Schaffnit, C.; Rossi, F.; Gibson, P.N.

    1996-12-31

    Based on X-ray diffraction and infrared spectroscopy measurements, BN thin films grown by PECVD on silicon substrates have been studied with the aim of identifying the thin film phase. In a set of samples, while the infrared spectra showed characteristic bands of the hexagonal phase, X-ray diffraction patterns only displayed reflections belonging to the cubic BN phase. Therefore, structural models have been developed to explain the apparent inconsistency between the two sets of experimental data. In particular, static disorder effects--which have been introduced in the model starting from the sp{sup 2} hybridization of the ordered hexagonal phase, as suggested by the infra-red spectroscopy results--allowed a consistent interpretation of the X-ray diffraction patterns. For another set of samples, which also showed a characteristic hexagonal signal in the IR data, the XRD pattern could not be indexed with any of the BN phases. In this case, the presence of molecular and ionic phases, associated with impurities, was considered in structural modeling studies.

  5. Structural and dielectric studies of Co doped MgTiO3 thin films fabricated by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Kumar, T. Santhosh; Gogoi, P.; Thota, S.; Pamu, D.

    2014-06-01

    We report the structural, dielectric and leakage current properties of Co doped MgTiO3 thin films deposited on platinized silicon (Pt/TiO2/SiO2/Si) substrates by RF magnetron sputtering. The role of oxygen mixing percentage (OMP) on the growth, morphology, electrical and dielectric properties of the thin films has been investigated. A preferred orientation of grains along (110) direction has been observed with increasing the OMP. Such evolution of the textured growth is explained on the basis of the orientation factor analysis followed the Lotgering model. (Mg1-xCox)TiO3 (x = 0.05) thin films exhibits a maximum relative dielectric permittivity of ɛr = 12.20 and low loss (tan δ ˜ 1.2 × 10-3) over a wide range of frequencies for 75% OMP. The role of electric field frequency (f) and OMP on the ac-conductivity of (Mg0.95Co0.05)TiO3 have been studied. A progressive increase in the activation energy (Ea) and relative permittivity ɛr values have been noticed up to 75% of OMP, beyond which the properties starts deteriorate. The I-V characteristics reveals that the leakage current density decreases from 9.93 × 10-9 to 1.14 × 10-9 A/cm2 for OMP 0% to 75%, respectively for an electric field strength of 250 kV/cm. Our experimental results reveal up to that OMP ≥ 50% the leakage current mechanism is driven by the ohmic conduction, below which it is dominated by the schottky emission.

  6. A Novel K-Band Tunable Microstrip Bandpass Filter Using a Thin Film HTS/Ferroelectric/ Dielectric Configuration

    NASA Technical Reports Server (NTRS)

    Subramanyam, G.; VanKeuls, F.; Miranda, F. A.

    1998-01-01

    We report on YBCO/strontium titanate (STO) thin film K-band tunable bandpass filters on lanthanum aluminate substrates. The 2 pole filters were designed for a center frequency of 19 GHz and 4% bandwidth. Tunability is achieved through the non-linear dc electric field dependence of the relative dielectric constant of STO (epsilon-rSTO). Center frequency shifts greater than 2 GHz were obtained at a 400V bipolar dc bias at temperatures below 77K, with minimum degradation in the insertion loss of the filters.

  7. Aluminum nitride thin film based acoustic wave sensors for biosensing applications

    NASA Astrophysics Data System (ADS)

    Xu, Jianzeng

    In recent years, SAW devices have drawn enormous interest from the analytical assay and sensing business, especially in the biosensing area where highly sensitive, cost efficient and miniaturized sensors are in urgent needs. This dissertation focuses on the development of AIN thin film based SAW devices suitable for biosensing applications. AIN thin films have been synthesized on different orientations of sapphire substrates by a plasma source molecular beam epitaxy system. Surface and structural characterization techniques have been applied to investigate the film quality and the results show that high quality c-plane AIN was epitaxially grown on both c-plane and a-plane sapphire substrates. Complete process flows have been developed for the fabrication of SAW delay line and resonator devices. Important electrical parameters such as the insertion loss, bandwidth, and impedance have been measured to assist the design optimization and derivation the phase velocity, electromechanical coupling coefficient, and temperature coefficient of frequency. On both c-plane and a-plane sapphire substrates, the SAW phase velocities (˜5700 m/s) and electromechanical coupling coefficients (˜0.3%) have been thoroughly mapped out with respect to the propagation direction and film thickness to wavelength ratio. The data are of practical importance for designing AIN-based SAW devices. A higher velocity (>6000 m/s) shear horizontal SAW mode has been discovered only at isolated propagating directions. This mode is especially suitable for aqueous biosensing due to its weak energy coupling to liquid. Much stronger response of the SH-SAW mode has been detected on the c-plane AIN on a-plane sapphire structure than on the c-plane AIN on c-plane sapphire structure, which could be attributed to large anisotropy in a-plane sapphire substrate. Linear frequency-temperature relationship has also been observed for both modes. We further quantify the mass sensitivity of the SAW and SH-SAW by

  8. Reactive magnetron cosputtering of hard and conductive ternary nitride thin films: Ti-Zr-N and Ti-Ta-N

    SciTech Connect

    Abadias, G.; Koutsokeras, L. E.; Dub, S. N.; Tolmachova, G. N.; Debelle, A.; Sauvage, T.; Villechaise, P.

    2010-07-15

    Ternary transition metal nitride thin films, with thickness up to 300 nm, were deposited by dc reactive magnetron cosputtering in Ar-N{sub 2} plasma discharges at 300 deg. C on Si substrates. Two systems were comparatively studied, Ti-Zr-N and Ti-Ta-N, as representative of isostructural and nonisostructural prototypes, with the aim of characterizing their structural, mechanical, and electrical properties. While phase-separated TiN-ZrN and TiN-TaN are the bulk equilibrium states, Ti{sub 1-x}Zr{sub x}N and Ti{sub 1-y}Ta{sub y}N solid solutions with the Na-Cl (B1-type) structure could be stabilized in a large compositional range (up to x=1 and y=0.75, respectively). Substituting Ti atoms by either Zr or Ta atoms led to significant changes in film texture, microstructure, grain size, and surface morphology, as evidenced by x-ray diffraction, x-ray reflectivity, and scanning electron and atomic force microscopies. The ternary Ti{sub 1-y}Ta{sub y}N films exhibited superior mechanical properties to Ti{sub 1-x}Zr{sub x}N films as well as binary compounds, with hardness as high as 42 GPa for y=0.69. All films were metallic, the lowest electrical resistivity {rho}{approx}65 {mu}{Omega} cm being obtained for pure ZrN, while for Ti{sub 1-y}Ta{sub y}N films a minimum was observed at y{approx}0.3. The evolution of the different film properties is discussed based on microstructrural investigations.

  9. Carbon Ion Irradiation Effects on Pulsed Laser Deposited Titanium Nitride Thin Films

    NASA Astrophysics Data System (ADS)

    Mahmood, Khaliq; Bashir, Shazia; Akram, Mahreen; Hayat, Asma; Faizan-Ul-Haq; Saadat, Shahzad

    2015-02-01

    Pulse laser deposited thin films of TiN are irradiated by 1 MeV carbon (C+) ions beam for various doses ranging 0.4 to 2.8 × 1014 ions/cm2. Atomic force microscopy (AFM) analysis reveals the formation of hillocks like structures after ion irradiation. X-ray diffraction (XRD) investigations show that the film crystallinity increases for lower doses ranging from 0.4 to 1.2 × 1014 ions/cm2 and decreases for higher doses (2 to 2.8 × 1014 ions/cm2) of ions. No new bands are identified from Raman spectroscopy. However, a noticeable change in microhardness has been observed. The hillock densities as well as hardness are strongly dependent upon ion dose.

  10. Growth kinetics and characterizations of gallium nitride thin films by remote PECVD

    NASA Technical Reports Server (NTRS)

    Choi, S. W.; Bachmann, K. J.; Lucovsky, G.

    1993-01-01

    Thin films of GaN have been deposited at relatively low growth temperatures by remote plasma-enhanced chemical-vapor deposition (RPECVD), using a plasma excited NH3, and trimethylgallium (TMG), injected downstream from the plasma. The activation energy for GaN growth has been tentatively assigned to the dissociation of NH groups as the primary N-atom precursors in the surface reaction with adsorbed TMG, or TMG fragments. At high He flow rates, an abrupt increase in the growth rate is observed and corresponds to a change in the reaction mechanism attributed to the formation of atomic N. XRD reveals an increased tendency to ordered growth in the (0001) direction with increasing growth temperature, He flow rate, and RF plasma power. IR spectra show the fundamental lattice mode of GaN at 530 cm without evidence for vibrational modes of hydrocarbon groups.

  11. Correlation between iron self-diffusion and thermal stability in doped iron nitride thin films

    NASA Astrophysics Data System (ADS)

    Tayal, Akhil; Gupta, Mukul; Kumar, D.; Reddy, V. R.; Gupta, Ajay; Amir, S. M.; Korelis, Panagiotis; Stahn, Jochen

    2014-12-01

    Nanocrystalline Fe-X-N thin films (with doping X = 0, 3.1 at. % Al, 1.6 at. % Zr), were deposited using reactive ion beam sputtering. Magnetization study reveals that the deposited films exhibit a perpendicular magnetic anisotropy. Thermal stability of the films was investigated systematically and it was observed that the structural and the magnetic stability gets significantly enhanced with Al doping, whereas Zr doping has only a marginal effect. Fe self-diffusion, obtained using polarized neutron reflectivity, shows a suppression with both additives. A correlation between the thermal stability and the diffusion process gives a direct evidence that the enhancement in the thermal stability is primarily diffusion controlled. A combined picture of diffusion, structural, and magnetic stability has been drawn to understand the obtained results.

  12. Improved Dielectric Properties of Heterostructured Ba2.5Sr0.5TiO3 Thin Film Composites for Microwave Dielectric Devices

    NASA Technical Reports Server (NTRS)

    Jain, M.; Majumder, S. B.; Katiyar, R. S.; Bhalla, A. S.; Agrawal, D. C.; Kulkarni, V. N.; VanKeuls, F. W.; Miranda, F. A.; Romanofsky, R. R.; Mueller, C. H.; Fernandez, F.

    2002-01-01

    In the present work we have deposited MgO and Ba(sub 0.5)Sr(sub 0.5)TiO(sub 3)(BST50) thin layers in different sequences to make MgO:BST50 hetero-structured thin films. These films were characterized by X-ray diffraction and Rutherford backscattering technique and found to be highly (100) textured. The figure of merit {(C(sub0)-C(sub v)/(C(sub0-tandelta)} of the hetero-structured films was found to be higher as compared to pure BST50 films measured at 1 MHz frequency with electric field of 25.3 kV/cm. These films were used to make eight element coupled micro-strip phase shifter and characterized in a frequency range of 13-15 GHz. The high frequency figure of merit (kappa factor, defined as the ratio of degree of phase shift per dB loss) measured at around 14 GHz with electric field of 333 kV/cm has been markedly improved (around 64.28 deg/dB for hetero-structured film as compared to 24.65 deg /dB for pure film). Improvement in dielectric properties in a wide frequency range in the MgO:BST are believed to be due to the higher densification of the hetero-structured films.

  13. Impact of forming gas annealing on the dielectric properties of SrBi2Ta2O9 thin films prepared by metalorganic decomposition

    NASA Astrophysics Data System (ADS)

    Wang, Dong-Sheng

    2012-10-01

    SrBi2Ta2O9 (SBT) thin films were prepared on Pt/TiO2/SiO2/Si substrates by metalorganic decomposition method. The dielectric properties of SBT films strongly depend on annealing conditions and annealing time. Compared with films not annealed in forming gas, the relative dielectric constant and the dissipation factor for SBT films annealed at 400 °C decrease by 23.4% and 30.6%, respectively. It implies that the dominant dielectric loss mechanism is related to the degradation of films. Forming gas ambient may have played an important role in the increase of oxygen vacancies in SBT thin films and the degradation of dielectric properties.

  14. Microwave dielectric and optical properties of amorphous and crystalline Ba0.5Sr0.5TiO3 thin films

    NASA Astrophysics Data System (ADS)

    Goud, J. Pundareekam; Joseph, Andrews; Ramakanth, S.; Naidu, Kuna Lakshun; Raju, K. C. James

    2016-05-01

    The thin films of composition Ba0.5Sr0.5TiO3 (BST5) were deposited by Pulsed Laser Deposition technique on amorphous fused silica substrates at room temperature (RT) and at 700°C. The film deposited at RT is amorphous while the other crystallized in cubic structure. The refractive index (n) and optical band gap (Eg) extracted from transmission spectra in the 190 -2500 nm range. Microwave dielectric properties were investigated using the Split Post Dielectric Resonators (SPDR) technique at spot frequencies of 10GHz and 20GHz. The experimental results show that thin films deposited at high temperature (700°C) shows very high dielectric constant for both 10GHz and 20 GHz. These high dielectric constant films can be used in a wide range of applications such as capacitors, non-volatile high speed random access memories, and electro-optic devices.

  15. Development and evaluation of gallium nitride-based thin films for x-ray dosimetry.

    PubMed

    Hofstetter, Markus; Howgate, John; Sharp, Ian D; Stutzmann, Martin; Thalhammer, Stefan

    2011-06-07

    X-ray radiation plays an important role in medical procedures ranging from diagnostics to therapeutics. Due to the harm such ionizing radiation can cause, it has become common practice to closely monitor the dosages received by patients. To this end, precise online dosimeters have been developed with the dual objectives of monitoring radiation in the region of interest and improving therapeutic methods. In this work, we evaluate GaN thin film high electron mobility heterostructures with sub-mm(2) detection areas as x-ray radiation detectors. Devices were tested using 40-300 kV Bremsstrahlung x-ray sources. We find that the photoconductive device response exhibits a large gain, is almost independent of the angle of irradiation, and is constant to within 2% of the signal throughout this medical diagnostic x-ray range, indicating that these sensors do not require recalibration for geometry or energy. Furthermore, the devices show a high sensitivity to x-ray intensity and can measure in the air kerma rate (free-in-air) range of 1 µGy s(-1) to 10 mGy s(-1) with a signal stability of ±1% and a linear total dose response over time. Medical conditions were simulated by measurements of device responses to irradiation through human torso phantoms. Direct x-ray imaging is demonstrated using the index finger and wrist sections of a human phantom. The results presented here indicate that GaN-based thin film devices exhibit a wide range of properties, which make them promising candidates for dosimetry applications. In addition, with potential detection volumes smaller than 10(-6) cm(3), they are well suited for high-resolution x-ray imaging. Moreover, with additional engineering steps, these devices can be adapted to potentially provide both in vivo biosensing and x-ray dosimetry.

  16. Al capping layers for nondestructive x-ray photoelectron spectroscopy analyses of transition-metal nitride thin films

    SciTech Connect

    Greczynski, Grzegorz Hultman, Lars; Petrov, Ivan; Greene, J. E.

    2015-09-15

    X-ray photoelectron spectroscopy (XPS) compositional analyses of materials that have been air exposed typically require ion etching in order to remove contaminated surface layers. However, the etching step can lead to changes in sample surface and near-surface compositions due to preferential elemental sputter ejection and forward recoil implantation; this is a particular problem for metal/gas compounds and alloys such as nitrides and oxides. Here, the authors use TiN as a model system and compare XPS analysis results from three sets of polycrystalline TiN/Si(001) films deposited by reactive magnetron sputtering in a separate vacuum chamber. The films are either (1) air-exposed for ≤10 min prior to insertion into the ultrahigh-vacuum (UHV) XPS system; (2) air-exposed and subject to ion etching, using different ion energies and beam incidence angles, in the XPS chamber prior to analysis; or (3) Al-capped in-situ in the deposition system prior to air-exposure and loading into the XPS instrument. The authors show that thin, 1.5–6.0 nm, Al capping layers provide effective barriers to oxidation and contamination of TiN surfaces, thus allowing nondestructive acquisition of high-resolution core-level spectra representative of clean samples, and, hence, correct bonding assignments. The Ti 2p and N 1s satellite features, which are sensitive to ion bombardment, exhibit high intensities comparable to those obtained from single-crystal TiN/MgO(001) films grown and analyzed in-situ in a UHV XPS system and there is no indication of Al/TiN interfacial reactions. XPS-determined N/Ti concentrations acquired from Al/TiN samples agree very well with Rutherford backscattering and elastic recoil analysis results while ion-etched air-exposed samples exhibit strong N loss due to preferential resputtering. The intensities and shapes of the Ti 2p and N 1s core level signals from Al/TiN/Si(001) samples do not change following long-term (up to 70 days) exposure to ambient conditions

  17. Flexible SiInZnO thin film transistor with organic/inorganic hybrid gate dielectric processed at 150 °C

    NASA Astrophysics Data System (ADS)

    Choi, J. Y.; Kim, S.; Hwang, B.-U.; Lee, N.-E.; Lee, S. Y.

    2016-12-01

    Silicon indium zinc oxide (SIZO) thin film transistors (TFTs) have been fabricated on a flexible polyimide (PI) substrate by using organic/inorganic hybrid gate dielectrics of poly-4vinyl phenol (PVP) and Al2O3. To improve the mechanical stability, Al2O3 has been used as a buffer layer on the flexible substrate. The Al2O3 layer of hybrid gate dielectrics protected the organic gate dielectric and improved mechanical flexibility. The different surface roughness of the gate dielectrics is investigated. The performance of the device with smooth surface roughness was significantly improved. Finally, the electrical characteristics of the TFTs with hybrid gate dielectrics were measured as well as the promising electrical endurance characteristics at the bending radius of 5 mm.

  18. Contributions to the dielectric losses of textured SrTiO3 thin films with Pt electrodes

    NASA Astrophysics Data System (ADS)

    Lu, Jiwei; Schmidt, Steffen; Ok, Young-Woo; Keane, Sean P.; Stemmer, Susanne

    2005-09-01

    The factors controlling low-frequency (1 MHz) dielectric losses of textured SrTiO3 thin films deposited by radio-frequency magnetron sputtering on platinized sapphire substrates were investigated. In particular, the influence of film texture, phase transformations, applied bias field, temperature, and annealing atmospheres was studied. Films that were (111) textured showed a phase transformation at ~150 K, whereas films that were predominantly (110) oriented did not exhibit a phase transformation in the measured temperature range (100-300 K). Two major contributions to the dielectric losses were identified: a low-temperature loss increase for the (111) oriented film, which could be suppressed by an applied bias field, and a loss peak at ~250 K (at 1 MHz), which was strongly frequency-dependent and likely associated with a relaxing defect. The low-temperature loss mode was related to the appearance of a phase transformation and contributed to the dielectric losses even at temperatures that were more than 100 K above the phase transformation. In contrast to the leakage properties of the films, which were strongly dependent on annealing atmospheres, annealing under reducing conditions had no significant influence on any of the observed loss modes. Possible origins of the different loss contributions were discussed.

  19. Induced Charge Electrokinetics Over ``Controllably Contaminated'' Surfaces: The Effects of Dielectric Thin Films and Surface Chemistry on Slip Velocity

    NASA Astrophysics Data System (ADS)

    Pascall, Andrew; Squires, Todd

    2009-11-01

    Microfluidics has renewed interest in utilizing electrokinetics (EK) for transporting fluids on small scales, and has subjected EK theories and understanding to new challenges. For example, induced-charge electro-osmosis (ICEO), a non-linear EK effect in which an externally applied AC electric field both induces and drives a layer of charged fluid near an electrically conductive surface, could provide an on-chip means to drive high pressures with low voltage [1]. Experimental data on ICEO and related phenomena have shown that the standard theory consistently overpredicts slip velocities by up to a factor of 1000[2]. Here we present experiments in which we controllably ``contaminate'' the metallic surface with a thin dielectric film or Au-thiol self assembled monolayer, and derive a theory for ICEO that incorporates both dielectric effects and surface chemistry, which both act to decrease the slip velocity relative to a `clean' metal. Data for over a thousand combinations of electric field strength and frequency, electrolyte composition, dielectric thickness and surface chemistry show essentially unprecedented quantitative agreement with our theory. [1] Squires & Bazant. J. Fluid Mech. 2004 [2] Bazant, et al. arXiv. 0903.4790

  20. Ultra-high-Q thin-silicon nitride strip-loaded ring resonators.

    PubMed

    Stefan, L; Bernard, M; Guider, R; Pucker, G; Pavesi, L; Ghulinyan, M

    2015-07-15

    We report on the design, fabrication, and characterization of thin Si3N4 ultra-high-quality (UHQ) factor ring resonators monolithically integrated on a silicon chip. The devices are based on a strip-loaded configuration and operate at both near-infrared (NIR) and third-telecom wavelengths. This approach allows us to use a guiding Si3N4 core that is one order of magnitude thinner than what has been reported in the past for obtaining similar device performances. Our strip-loaded devices benefit from the absence of physically etched lateral boundaries to show minute light scattering and, therefore, reducing significantly scattering-related losses. Consequently, UHQs of 3.7×10(6) in the NIR and high-quality factors of up to 9×10(5) in the C-band were measured for the guiding material thickness of 80 nm and 115 nm, respectively. These first results are subject to further improvements that may allow employing strip-loaded resonators in nonlinear frequency conversion or quantum computing schemes within the desired spectral range provided by the material transparency.

  1. Low-dielectric-constant fluorinated diamond-like carbon thin films by plasma-enhanced chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Yi, Jeong Woo

    Fluorinated amorphous carbon (a-C:F) thin films are developed for a low dielectric constant interlayer dielectric material from hexafluorobenze (C 6F6) or 1,1,1,2-tetrafluoroethane (FCH2CF 4) as the source gas and argon as the diluent gas in an asymmetric capacitively coupled rf (radio frequency) plasma reactor and an inductively coupled plasma reactor. Effects of input rf power, fluorination, applied bias voltage and post annealing on the properties of a-C:F films are investigated. For depositing a-C:F films from highly diluted C6F6 (3%) and argon (97%) in the capacitively rf plasma reactor at 150 mTorr, the dielectric constant of the film increases from 2.0 to 2.8 as the rf power is increased from 10 W to 70 W, while the optical energy gap decreases from 2.6 eV to 1.9 eV and the transparency in a ultra-violet range is degraded. At input power of 100 W, the deposited film exhibits high residual stress of 40 MPa and easily peeled off by a Scotch tape test. This is due to high self-bias voltage (-230 V) developed at the substrate holder during deposition. When depositing amorphous carbon films from tetrafluoroethane (TFE) and methane in the capacitively coupled plasma reactor, the incorporation of fluorine in the film is increased with increasing TFE fraction in the feed gas mixture. The dielectric constant of the a-C:F film deposited from pure TFE is as low as 2.3, but the film exhibits poor thermal stability while a-C:H (diamond-like carbon) film deposited from pure methane has a dielectric constant of 3.8 and shows good thermal stability up to 400°C. As the TFE content in the feed is increased, the dielectric constant and the refractive index decrease while the transparency of the film is enhanced significantly. When depositing a-C:F films from C6F6 (4 sccm) and Ar (5 sccm) in the inductively coupled rf plasma reactor, the bias voltage (from a separate 100 KHz source) applied to the substrate holder affects the film properties significantly. As the negative bias

  2. Test results for electron beam charging of flexible insulators and composites. [solar array substrates, honeycomb panels, and thin dielectric films

    NASA Technical Reports Server (NTRS)

    Staskus, J. V.; Berkopec, F. D.

    1979-01-01

    Flexible solar-array substrates, graphite-fiber/epoxy - aluminum honeycomb panels, and thin dielectric films were exposed to monoenergetic electron beams ranging in energy from 2 to 20 keV in the Lewis Research Center's geomagnetic-substorm-environment simulation facility to determine surface potentials, dc currents, and surface discharges. The four solar-array substrate samples consisted of Kapton sheet reinforced with fabrics of woven glass or carbon fibers. They represented different construction techniques that might be used to reduce the charge accumulation on the array back surface. Five honeycomb-panel samples were tested, two of which were representative of Voyager antenna materials and had either conductive or nonconductive painted surfaces. A third sample was of Navstar solar-array substrate material. The other two samples were of materials proposed for use on Intelsat V. All the honeycomb-panel samples had graphite-fiber/epoxy composite face sheets. The thin dielectric films were 2.54-micrometer-thick Mylar and 7.62-micrometer-thick Kapton.

  3. Dielectric characterization of Bi3.25La0.75Ti3O12 thin films

    NASA Astrophysics Data System (ADS)

    Wu, Di; Li, Aidong; Ming, Naiben

    2004-05-01

    Dielectric properties of Pt/Bi3.25La0.75Ti3O12(BLaT)/Pt ferroelectric thin film capacitors were studied as functions of frequency (40-106 Hz) and temperature (30-590 °C). BLaT thin films showed a first-order para-ferroelectric transition around 400 °C. Pt/BLaT/Pt capacitors post-annealed in Ar exhibited broadened transition with larger losses, which was interpreted in terms of increased oxygen vacancies. Via complex impedance spectroscopy study, the conduction activation energy of the space charges was determined to be ˜1.1 eV, close to that of oxygen vacancies in perovskite materials. The impedance characteristics of Pt/BLaT/Pt were compared with those of Pt/SrBi2Ta2O9(SBT)/Pt capacitors. The impact of dielectric characteristics on fatigue resistance of BLaT films was briefly discussed in comparison with SBT films.

  4. Nanoindentation study of niobium nitride thin films on niobium fabricated by reactive pulsed laser deposition

    SciTech Connect

    Mamun, Md Abdullah Al; Farha, Ashraf Hassan; Ufuktepe, Yüksel; Elsayed-Ali, Hani E.; Elmustafa, Abdelmageed A.

    2015-03-01

    Nanomechanical and structural properties of NbNx films deposited on single crystal Nb using pulsed laser deposition for different substrate temperature were previously investigated as a function of film/substrate crystal structure (Mamun et al. (2012) [30]). In this study we focus on the effect of laser fluences and background nitrogen pressure on the nanomechanical and structural properties of NbNx films. The crystal structure and surface morphology of the thin films were tested by X-ray diffraction, scanning electron microscopy, and atomic force microscopy. Using nanoindentation, the investigation of the nanomechanical properties revealed that the hardness of the NbNx films was directly influenced by the laser fluence for low background nitrogen pressure, whereas the nanomechanical hardness showed no apparent correlation with laser fluence at high background nitrogen pressure. The NbNx film hardness measured at 30% film thickness increased from 14.0 ± 1.3 to 18.9 ± 2.4 GPa when the laser fluence was increased from 15 to 25 J/cm2 at 10.7 Pa N2 pressure. X-ray diffraction showed NbNx films with peaks that correspond to δ-NbN cubic and β-Nb2N hexagonal phases in addition to the δ'-NbN hexagonal phase. Finally, increasing the laser fluence resulted in NbNx films with larger grain sizes.

  5. Room temperature analysis of dielectric function of ZnO-based thin film on fused quartz substrate

    SciTech Connect

    Kurniawan, Robi; Sutjahja, Inge M.; Winata, Toto; Rusydi, Andrivo; Darma, Yudi

    2015-09-30

    A set of sample consist of pure ZnO and Cu-doped ZnO film were grown on fused-quartz substrates using pulsed laser deposition (PLD) technique. Here, we report room temperature spectroscopic ellipsometry analysis (covering energy range of 0.5 to 6.3 eV) of pure ZnO film and Cu doped ZnO film at 8 in at. %. The thickness of pure ZnO and Cu-doped ZnO film using in this study is about 350 nm. To extract the dielectric function of ZnO thin film, multilayer modeling is performed which takes into account reflections at each interface through Fresnel coefficients. This method based on Drude-Lorentz models that connect with Kramers-Kronig relations. The best fitting of Ψ (amplitude ratio) and Δ (phase difference) taken by SE measurement are obtained reasonably well by mean the universal fitting of three different photon incident angles. The imaginary part of dielectric function (ε{sub 2}) show the broad peak at around 3.3 eV assigned as combination of optical band energy edge with excitonic states. The exitonic states could not be observed clearly in this stage. The evolution of extracted dielectric function is observable by introducing 8% Cu as indicated by decreasing of excitonic intensity. This result indicates the screening of excitonic state. This study will bring us to have a good undestanding for the role of Cu impurities for ZnO thin films.

  6. Epitaxial Growth of MOF Thin Film for Modifying the Dielectric Layer in Organic Field-Effect Transistors.

    PubMed

    Gu, Zhi-Gang; Chen, Shan-Ci; Fu, Wen-Qiang; Zheng, Qingdong; Zhang, Jian

    2017-03-01

    Metal-organic framework (MOF) thin films are important in the application of sensors and devices. However, the application of MOF thin films in organic field effect transistors (OFETs) is still a challenge to date. Here, we first use the MOF thin film prepared by a liquid-phase epitaxial (LPE) approach (also called SURMOFs) to modify the SiO2 dielectric layer in the OFETs. After the semiconductive polymer of PTB7-Th (poly[4,8-bis(5-(2-ethylhexyl)thiophene-2-yl)benzo[1,2-b:4,5-b']dithiophene-co-3-fluorothieno[3,4-b]thiophene-2-carboxylate]) was coated on MOF/SiO2 and two electrodes on the semiconducting film were deposited sequentially, MOF-based OFETs were fabricated successfully. By controlling the LPE cycles of SURMOF HKUST-1 (also named Cu3(BTC)2, BTC = 1,3,5-benzenetricarboxylate), the performance of the HKUST-1/SiO2-based OFETs showed high charge mobility and low threshold voltage. This first report on the application of MOF thin film in OFETs will offer an effective approach for designing a new kind of materials for the OFET application.

  7. Organic Electronic Devices Using Crosslinked Polyelectrolyte Multilayers as an Ultra-Thin Dielectric Material

    DTIC Science & Technology

    2006-09-01

    2.3.2.2 Function of heat treatment temperature……………………...…54 2.3.3 Heat-induced Crosslinking within PEI /PAA Films……………….………….…..57 2.4 Conclusion...strength as a function of dielectric thickness…………..70 3.3.3 Tertiary Amide Crosslinking with Linear Poly(ethylenimine) ( PEI )……….….…79 3.4...breakdown strength of these dielectric films is then analyzed as a function of their degree of cross-linking, layer morphology, and film thickness to

  8. Dielectric properties of aluminum silver alloy thin films in optical frequency range

    SciTech Connect

    Yang Guang; Sun Jingbo; Zhou Ji

    2011-06-15

    The dielectric properties of direct current (dc) magnetron sputtering aluminum silver alloy films in optical frequency have been quantitatively studied by variable angle spectroscopic ellipsometry. The structure and surface topography of the alloy films were characterized using scanning probe microscopy and x-ray diffraction. The Drude-Lorentz model was used to simulate the dielectric function of Al-Ag alloy films. Meanwhile, the effective medium theory has been utilized for the treatment of surface roughness. We found that the interband transition around 1.5 eV can be shifted through a variable annealing temperature and a changeable silver percentage of Al-Ag alloys.

  9. ZrO2 Layer Thickness Dependent Electrical and Dielectric Properties of BST/ZrO2/BST Multilayer Thin Films

    SciTech Connect

    Sahoo, S. K.; Misra, D.; Agrawal, D. C.; Mohapatra, Y. N.

    2011-01-01

    Recently, high K materials play an important role in microelectronic devices such as capacitors, memory devices, and microwave devices. Now a days ferroelectric barium strontium titanate [Ba{sub x}Sr{sub 1-x}TiO{sub 3}, (BST)] thin film is being actively investigated for applications in dynamic random access memories (DRAM), field effect transistor (FET), and tunable devices because of its properties such as high dielectric constant, low leakage current, low dielectric loss, and high dielectric breakdown strength. Several approaches have been used to optimize the dielectric and electrical properties of BST thin films such as doping, graded compositions, and multilayer structures. We have found that inserting a ZrO{sub 2} layer in between two BST layers results in a significant reduction in dielectric constant, loss tangent, and leakage current in the multilayer thin films. Also it is shown that the properties of multilayer structure are found to depend strongly on the sublayer thicknesses. In this work the effect of ZrO{sub 2} layer thickness on the dielectric, ferroelectric as well as electrical properties of BST/ZrO{sub 2}/BST multilayer structure is studied. The multilayer Ba{sub 0.8}Sr{sub 0.2}TiO{sub 3}/ZrO{sub 2}/Ba{sub 0.8}Sr{sub 0.2}TiO{sub 3} film is deposited by a sol-gel process on the platinized Si substrate. The thickness of the middle ZrO{sub 2} layer is varied while keeping the top and bottom BST layer thickness as fixed. It is observed that the dielectric constant, dielectric loss tangent, and leakage current of the multilayer films reduce with the increase of ZrO{sub 2} layer thickness and hence suitable for memory device applications. The ferroelectric properties of the multilayer film also decrease with the ZrO{sub 2} layer thickness.

  10. Selective femtosecond laser structuring of dielectric thin films with different band gaps: a time-resolved study of ablation mechanisms

    NASA Astrophysics Data System (ADS)

    Rapp, Stephan; Schmidt, Michael; Huber, Heinz P.

    2016-12-01

    Ultrashort pulse lasers have been increasingly gaining importance for the selective structuring of dielectric thin films in industrial applications. In a variety of works the ablation of thin SiO2 and SiNx films from Si substrates has been investigated with near infrared laser wavelengths with photon energies of about 1.2 eV where both dielectrics are transparent (E_{{gap,SiO2}}≈ 8 eV; E_{{gap,SiN}x}≈ 2.5 eV). In these works it was found that few 100 nm thick SiO2 films are selectively ablated with a "lift-off" initiated by confined laser ablation whereas the SiN_{{x}} films are ablated by a combination of confined and direct laser ablation. In the work at hand, ultrafast pump-probe imaging was applied to compare the laser ablation dynamics of the two thin film systems directly with the uncoated Si substrate—on the same setup and under identical parameters. On the SiO2 sample, results show the pulse absorption in the Si substrate, leading to the confined ablation of the SiO2 layer by the expansion of the substrate. On the SiN_{{x}} sample, direct absorption in the layer is observed leading to its removal by evaporation. The pump-probe measurements combined with reflectivity corrected threshold fluence investigations suggest that melting of the Si substrate is sufficient to initiate the lift-off of an overlaying transparent film—evaporation of the substrate seems not to be necessary.

  11. Surface investigations of the atomic layer growth mechanism in aluminum nitride thin film deposition using dimethylethylamine alane and ammonia

    NASA Astrophysics Data System (ADS)

    Kuo, Jason Se-Yung

    Aluminum Nitride (AlN), a wide-bandgap semiconductor, has been shown to be an extremely versatile material in semiconductor applications. Our previous efforts in formulating a Metalorganic Chemical Vapor Deposition (MOCVD) processing strategy to deposit AN using Dimethylethylamine Alane (DMEAA; AlH3:N(CH3)2CH2CH3) and ammonia resulted in high quality film growth at low temperatures (˜600 K). Understanding the surface reactions involved is a key step in successfully optimizing a MOCVD process. In this research, we investigated the surface interactions between DMEAA and ammonia leading to the Atomic Layer Growth (ALG) mode on a Si(100) surface using a combination of surface analysis techniques, including Secondary-Ion Mass Spectrometry (SIMS), Temperature-Programmed SIMS (TPSIMS), X-ray Photoelectron Spectroscopy (XPS), and Temperature-Programmed Desorption (TPD). The exposure of Si(100) to DMEAA at 310 K resulted in self-limiting adsorption of molecular DMEAA and Dimethylethylamine (DMEA). Based on the stoichiometric information from XPS, the molecularly adsorbed DMEA most likely originated from the exposure of a mixed DMEAA-DMEA gas phase rather than a dissociative adsorption process. The DMEAA molecule is susceptible to thermal decomposition, as the aminealane adduct configuration was no longer observed above 490 K. This can impose an upper temperature limit in developing a processing strategy. The chemical interaction between ammonia and DMEAA resulted in a displacement of DMEA by ammonia. A new surface intermediate (AlHND2) was detected with both SIMS and XPS. This displacement mechanism was rationalized using Hard-Soft-Acid-Base (HSAB) theory. We were able to observe, in a step-by-step fashion, the atomic layer growth process by monitoring the C:N ratios using XPS. The resulting AlN film contained substantial hydrogen but the hydrogen content may be removed thermally. Atomic layer growth mechanism provides an effective means to grow high quality thin films by

  12. Dielectric Investigation of Parylene D Thin Films: Relaxation and Conduction Mechanisms.

    PubMed

    Mokni, M; Kahouli, A; Jomni, F; Garden, J-L; André, E; Sylvestre, A

    2015-09-03

    Parylene is a generic name indicating a family of polymers with the basic chemical structure of poly-p-xylylene. Parylene N and Parylene C are the most popular for applications. Curiously, Parylene D (poly( dichloro-p-xylylene), (C8H6Cl2)) was forgotten for applications. This report is the consequence of a later availability of a commercial dimer of Parylene D and also to the recent advent of fluorinated Parylenes allowing extending applications at higher temperatures. In our work, from a dielectric analysis, we present the potentialities of Parylene D for applications particularly interesting for integration in organic field-effect transistors. Dielectric and electrical properties, macromolecular structures, and dynamics interaction with electric field as a function of frequency and temperature are studied in 5.8 μm thick Parylene D grown by chemical vapor deposition. More exactly, the dielectric permittivity, the dissipation factor, the electrical conductivity, and the electric modulus of Parylene D were investigated in a wide temperature and frequency ranges from -140 to +350 °C and from 0.1 Hz to 1 MHz, respectively. According to the temperature dependence of the dielectric permittivity, Parylene D has two different dielectric responses. It is retained as a nonpolar material at very low temperature (like Parylene N) and as a polar material at high temperature (like parylene C). The dissipation factor shows the manifestation of two relaxations mechanisms: γ and β at very low and high temperatures, respectively. The γ relaxation is assigned to the local motions of the C-H end of the chains when the cryogenic temperature range is approached. A broad peak in tan δ is assigned to the β relaxation. It corresponds to rotational motion of some polar C-Cl groups. For temperature above 260 °C a mechanism of Maxwell-Wagner-Sillars polarization at the amorphous/crystalline interfaces was identified with two activation energies of Ea1 = 2.12 eV and Ea2 = 3.8 e

  13. Synthesis and frequency-dependent dielectric properties of epitaxial La1.875Sr0.125NiO4 thin films

    SciTech Connect

    Podpirka, Adrian; Tselev, Alexander; Ramanathan, Shriram

    2012-01-01

    Epitaxial thin films of La{sub 1.875}Sr{sub 0.125}NiO{sub 4} (lanthanum strontium nickelate, LSNO) have been synthesized by sputtering onto single crystal oxide substrates and their structural and dielectric properties are reported. High dielectric constants on the order of 10{sup 7} have been measured up to 1 MHz in interdigitated capacitors with a frequency dependence that correlates with substrate imposed strain and texture. The observation of a high dielectric constant albeit with moderate loss tangent at high frequencies motivates further explorations of charge ordering phenomena in such complex oxides and serves to examine size effects on dielectric response by comparison with studies on bulk single crystal LSNO.

  14. Collaboration of the NASA Glenn Research Center and Rolls-Royce Developed Thin Film Multilayered Dielectrics for Harsh Environments

    NASA Technical Reports Server (NTRS)

    Wrbanek, John D.; Fralick, Gustave C.; Busfield, A. Rachel; Thomas, Valarie D.; Blaha, Charles A.

    2003-01-01

    The use of thin films to electrically insulate thin film sensors on engine components minimizes the intrusiveness of the sensors and allows a more accurate measurement of the environment. A variety of insulating films were investigated for preventing electrical shorting caused by insulator failure between the sensor and the component. By alternating layers of sputtered high-temperature ceramics, a sequence of insulating layers was devised that (1) prevents pinholes from forming completely through the insulator and (2) maintains high electrical resistivity at high temperatures. The total thickness is only a fraction of that needed for conventional insulating techniques. The Sensors and Electronics Technology Branch of the NASA Glenn Research Center has an in-house effort to develop thin film sensors for surface measurement in propulsion system research. Thin film sensors do not require special machining of the components on which they are mounted, and they are considerably thinner (less than 10 mm thick) than wire or foil sensors. The thin film sensors are thus much less disturbing to the operating environment and have a minimal impact on the physical characteristics of the supporting component. To further this research, NASA Glenn and Rolls-Royce (Derby, UK), with assistance from the Ohio Aerospace Institute (OAI) and the Akima Corporation, pursued a joint investigation using multilayered thin film dielectrics as a reliable insulator in harsh environments. The use of a multilayered scheme is thought to be promising for the fabrication of electrically insulating thin films. A major cause of conduction in thin film dielectrics is the presence of defects, such as pinholes, that propagate through the film to the underlying substrate surface. By alternating the insulating material, each new growth pattern would deviate from the previous one, eliminating direct pathways for conduction to the substrate. The film depositions and testing were conducted in the Instrument

  15. Low-voltage Organic Thin Film Transistors (OTFTs) with Solution-processed High-k Dielectric cum Interface Engineering

    NASA Astrophysics Data System (ADS)

    Su, Yaorong

    Although impressive progress has been made in improving the performance of organic thin film transistors (OTFTs), the high operation voltage resulting from the low gate areal capacitance of traditional SiO 2 remains a severe limitation that hinders OTFTs' development in practical applications. In this regard, developing new materials with high- k characteristics at low cost is of great scientific and technological importance in the area of both academia and industry. In this thesis, we first describe a simple solution-based method to fabricate a high-k bilayer Al2Oy/TiOx (ATO) dielectric system at low temperature. Then the dielectric properties of the ATO are characterized and discussed in detail. Furthermore, by employing the high-k ATO as gate dielectric, low-voltage copper phthalocyanine (CuPc) based OTFTs are successfully developed. Interestingly, the obtained low-voltage CuPc TFT exhibits outstanding electrical performance, which is even higher than the device fabricated on traditional low-k SiO2. The above results seem to be contradictory to the reported results due to the fact that high-k usually shows adverse effect on the device performance. This abnormal phenomenon is then studied in detail. Characterization on the initial growth shows that the CuPc molecules assemble in a "rod-like" nano crystal with interconnected network on ATO, which probably promotes the charge carrier transport, whereas, they form isolated small islands with amorphous structure on SiO2. In addition, a better metal/organic contact is observed on ATO, which benefits the charge carrier injection. Our studies suggest that the low-temperature, solution-processed high-k ATO is a promising candidate for fabrication of high-performance, low-voltage OTFTs. Furthermore, it is well known that the properties of the dielectric/semiconductor and electrode/semiconductor interfaces are crucial in controlling the electrical properties of OTFTs. Hence, investigation the effects of interfaces

  16. Thickness Dependent Structural and Dielectric Properties of Calcium Copper Titanate Thin Films Produced by Spin-Coating Method for Microelectronic Devices

    NASA Astrophysics Data System (ADS)

    Thiruramanathan, P.; Sankar, S.; Marikani, A.; Madhavan, D.; Sharma, Sanjeev K.

    2017-03-01

    Calcium copper titanate (CaCu3Ti4O12, CCTO) thin films have been deposited on platinized silicon [(111)Pt/Ti/SiO2/Si] substrate through a sol-gel spin coating technique and annealed at 600-900°C with a variation of 100°C per sample for 3 h. The activation energy for crystalline growth, as well as optimal annealing temperature (900°C) of the CCTO crystallites was studied by x-ray diffraction analysis (XRD). Thickness dependent structural, morphological, and optical properties of CCTO thin films were observed. The field emission scanning electron microscopy (FE-SEM) verified that the CCTO thin films are uniform, fully covered, densely packed, and the particle size was found to be increased with film thickness. Meanwhile, quantitative analysis of dielectric properties (interfacial capacitance, dead layers, and bulk dielectric constant) of CCTO thin film with metal-insulator-metal (M-I-M) structures has been investigated systematically using a series capacitor model. Room temperature dielectric properties of all the samples exhibit dispersion at low frequencies, which can be explained based on Maxwell-Wagner two-layer models and Koop's theory. It was found that the 483 nm thick CCTO film represents a high dielectric constant (ɛ r = 3334), low loss (tan δ = 3.54), capacitance (C = 4951 nF), which might satisfy the requirements of embedded capacitor.

  17. Microwave dielectric properties of BNT-BT0.08 thin films prepared by sol-gel technique

    NASA Astrophysics Data System (ADS)

    Huitema, L.; Cernea, M.; Crunteanu, A.; Trupina, L.; Nedelcu, L.; Banciu, M. G.; Ghalem, A.; Rammal, M.; Madrangeas, V.; Passerieux, D.; Dutheil, P.; Dumas-Bouchiat, F.; Marchet, P.; Champeaux, C.

    2016-04-01

    We report for the first time the microwave characterization of 0.92(Bi0.5Na0.5)TiO3-0.08BaTiO3 (BNT-BT0.08) ferroelectric thin films fabricated by the sol-gel method and integrated in both planar and out-of-plane tunable capacitors for agile high-frequency applications and particularly on the WiFi frequency band from 2.4 GHz to 2.49 GHz. The permittivity and loss tangent of the realized BNT-BT0.08 layers have been first measured by a resonant cavity method working at 12.5 GHz. Then, we integrated the ferroelectric material in planar inter-digitated capacitors (IDC) and in out-of-plane metal-insulator-metal (MIM) devices and investigated their specific properties (dielectric tunability and losses) on the whole 100 MHz-15 GHz frequency domain. The 3D finite-elements electromagnetic simulations of the IDC capacitances are fitting very well with their measured responses and confirm the dielectric properties determined with the cavity method. While IDCs are not exhibiting an optimal tunability, the MIM capacitor devices with optimized Ir/MgO(100) bottom electrodes demonstrate a high dielectric tunability, of 30% at 2.45 GHz under applied voltages as low as 10 V, and it is reaching 50% under 20 V voltage bias at the same frequency. These high-frequency properties of the MIM devices integrating the BNT-BT0.08 films, combining a high tunability under low applied voltages indicate a wide integration potential for tunable devices in the microwave domain and particularly at 2.45 GHz, corresponding to the widely used industrial, scientific, and medical frequency band.

  18. Layered CU-based electrode for high-dielectric constant oxide thin film-based devices

    DOEpatents

    Auciello, Orlando

    2010-05-11

    A layered device including a substrate; an adhering layer thereon. An electrical conducting layer such as copper is deposited on the adhering layer and then a barrier layer of an amorphous oxide of TiAl followed by a high dielectric layer are deposited to form one or more of an electrical device such as a capacitor or a transistor or MEMS and/or a magnetic device.

  19. Optical investigation of the natural electron doping in thin MoS2 films deposited on dielectric substrates.

    PubMed

    Sercombe, D; Schwarz, S; Del Pozo-Zamudio, O; Liu, F; Robinson, B J; Chekhovich, E A; Tartakovskii, I I; Kolosov, O; Tartakovskii, A I

    2013-12-12

    Two-dimensional (2D) compounds provide unique building blocks for novel layered devices and hybrid photonic structures. However, large surface-to-volume ratio in thin films enhances the significance of surface interactions and charging effects requiring new understanding. Here we use micro-photoluminescence (PL) and ultrasonic force microscopy to explore the influence of the dielectric environment on optical properties of a few monolayer MoS2 films. PL spectra for MoS2 films deposited on SiO2 substrates are found to vary widely. This film-to-film variation is suppressed by additional capping of MoS2 with SiO2 and Si(x)N(y), improving mechanical coupling of MoS2 with surrounding dielectrics. We show that the observed PL non-uniformities are related to strong variation in the local electron charging of MoS2 films. In completely encapsulated films, negative charging is enhanced leading to uniform optical properties. Observed great sensitivity of optical characteristics of 2D films to surface interactions has important implications for optoelectronics applications of layered materials.

  20. Impact of reductive N2/H2 plasma on porous low-dielectric constant SiCOH thin films

    NASA Astrophysics Data System (ADS)

    Cui, Hao; Carter, Richard J.; Moore, Darren L.; Peng, Hua-Gen; Gidley, David W.; Burke, Peter A.

    2005-06-01

    Porous low-dielectric constant (low-κ) SiCOH thin films deposited using a plasma-enhanced chemical-vapor deposition have been comprehensively characterized before and after exposure to a reactive-ion-etch-type plasma of N2 and H2 chemistry. The low-κ film studied in this work is a carbon-doped silicon oxide film with a dielectric constant (κ) of 2.5. Studies show that a top dense layer is formed as a result of significant surface film densification after exposure to N2/H2 plasma while the underlying bulk layer remains largely unchanged. The top dense layer is found to seal the porous bulk SiCOH film. SiCOH films experienced significant thickness reduction, κ increase, and leakage current degradation after plasma exposure, accompanied by density increase, pore collapse, carbon depletion, and moisture content increase in the top dense layer. Both film densification and removal processes during N2/H2 plasma treatment were found to play important roles in the thickness reduction and κ increase of this porous low-κ SiCOH film. A model based upon mutually limiting film densification and removal processes is proposed for the continuous thickness reduction during plasma exposure. A combination of surface film densification, thickness ratio increase of top dense layer to bulk layer, and moisture content increase results in the increase in κ value of this SiCOH film.

  1. Influence of metallic and dielectric nanowire arrays on the photoluminescence properties of P3HT thin films.

    PubMed

    Handloser, M; Dunbar, R B; Wisnet, A; Altpeter, P; Scheu, C; Schmidt-Mende, L; Hartschuh, A

    2012-08-03

    The optical properties of organic semiconductor thin films deposited on nanostructured surfaces are investigated using time-resolved two-photon photoluminescence (PL) microscopy. The surfaces consist of parallel aligned metallic or dielectric nanowires forming well-defined arrays on glass substrates. Keeping the nanowire dimensions constant and varying only their spacing from 40 to 400 nm, we study the range of different types of nanowire-semiconductor interactions. For silver nanowires and spacings below 100 nm, the PL intensity and lifetime of P3HT and MDMO-PPV decrease rapidly due to the short-ranged metal-induced quenching that dominates the PL response with respect to a possible plasmonic enhancement of optical transition rates. In the case of P3HT however, we observe an additional longer-ranged reduction of non-radiative losses for both metallic and dielectric nanowires that is not observed for MDMO-PPV. Excitation polarization dependent measurements indicate that this reduction is due to self-assembly of the P3HT polymer chains along the nanowires. In conclusion, nanostructured surfaces, when fabricated across large areas, could be used to control film morphologies and to improve energy transport and collection efficiencies in P3HT-based solar cells.

  2. Corrosion Protection Of Front Surface Aluminum Mirror Coatings With Dielectric Thin Films Deposited By Reactive Ion Plating

    NASA Astrophysics Data System (ADS)

    Guenther, Karl H.; Penny, Iain; Willey, Ronald R.

    1990-01-01

    Front surface metal mirrors need protection of the inherently fragile metal film normally deposited by evaporation in high vacuum. Dielectric thin films, also deposited by thermal or electron beam evaporation in high vacuum, provide limited protection because of their less than dense packing. These films usually have a columnar structure with voids between the columns. The voids give access to the metal film for humidity and corrosive gases or liquids. Sainty et al. [Appl. Opt. 23, 1116 (1984)] made some progress in developing better protective coatings with ion assisted deposition. We manufactured protected front surface aluminum mirrors using reactive ion plating deposition. When immersed in 0.2M NaOH, our best mirror survived for 20 hours while only degrading to a transmission of 10%, exceeding the results of Sainty et al. by a factor of 5 under the same test conditions. Electron beam evaporated dielectric coatings provided protection for about 1.5 to 2 hours in the same solution. We will discuss the reason for the significant improvement brought about by low voltage reactive ion plating deposition, and its advantage for large scale production.

  3. Optical investigation of the natural electron doping in thin MoS2 films deposited on dielectric substrates

    PubMed Central

    Sercombe, D.; Schwarz, S.; Pozo-Zamudio, O. Del; Liu, F.; Robinson, B. J.; Chekhovich, E. A.; Tartakovskii, I. I.; Kolosov, O.; Tartakovskii, A. I.

    2013-01-01

    Two-dimensional (2D) compounds provide unique building blocks for novel layered devices and hybrid photonic structures. However, large surface-to-volume ratio in thin films enhances the significance of surface interactions and charging effects requiring new understanding. Here we use micro-photoluminescence (PL) and ultrasonic force microscopy to explore the influence of the dielectric environment on optical properties of a few monolayer MoS2 films. PL spectra for MoS2 films deposited on SiO2 substrates are found to vary widely. This film-to-film variation is suppressed by additional capping of MoS2 with SiO2 and SixNy, improving mechanical coupling of MoS2 with surrounding dielectrics. We show that the observed PL non-uniformities are related to strong variation in the local electron charging of MoS2 films. In completely encapsulated films, negative charging is enhanced leading to uniform optical properties. Observed great sensitivity of optical characteristics of 2D films to surface interactions has important implications for optoelectronics applications of layered materials. PMID:24336152

  4. Dielectric relaxation and conduction mechanisms in sprayed TiO2 thin films as a function of the annealing temperature

    NASA Astrophysics Data System (ADS)

    Juma, Albert; Acik, Ilona Oja; Mere, Arvo; Krunks, Malle

    2016-04-01

    The electrical properties of TiO2 thin films deposited by chemical spray pyrolysis onto Si substrates were investigated in the metal-oxide-semiconductor (MOS) configuration using current-voltage characteristics and impedance spectroscopy. The electrical properties were analyzed in relation to the changes in microstructure induced during annealing in air up to a temperature of 950 °C. Anatase to rutile transformation started after annealing at 800 °C, and at 950 °C, only the rutile phase was present. The dielectric relaxation strongly depended upon the microstructure of TiO2 with the dielectric constant for the anatase phase between 45 and 50 and that for the rutile phase 123. Leakage current was reduced by three orders of magnitude after annealing at 700 °C due to the densification of the TiO2 film. A double-logarithmic plot of the current-voltage characteristics showed a linear relationship below 0.12 V consistent with Ohmic conduction, while space-charge-limited conduction mechanism as described by Child's law dominated for bias voltages above 0.12 V.

  5. Chain relaxation in thin polymer films: turning a dielectric type-B polymer into a type-A' one.

    PubMed

    Solar, Mathieu; Paul, Wolfgang

    2017-02-22

    A molecular dynamics simulation study of chain relaxation in a thin polymer film is presented, studying the dielectric response of a random copolymer of cis and trans 1,4-polybutadiene, a type B polymer without net chain dipole moment, confined between graphite walls. We stress the orientational effect of the attractive walls, inducing polarization in the vicinity of the walls, while the center of the film stays bulk-like. This polarization leads to a net dipole moment of the adsorbed chains, which is perpendicular to their end-to-end vector, which we termed as type A' behavior. In this situation, the dipole moment relaxes only upon desorption of the chains from the wall, a dynamic process which occurs on timescales much longer than the bulk relaxation time of the polymer.

  6. Mechanical and dielectric characterization of lead zirconate titanate(PZT)/polyurethane(PU) thin film composite for energy harvesting

    NASA Astrophysics Data System (ADS)

    Aboubakr, S.; Rguiti, M.; Hajjaji, A.; Eddiai, A.; Courtois, C.; d'Astorg, S.

    2014-04-01

    The Lead Zirconate titanate (PZT) ceramic is known by its piezoelectric feature, but also by its stiffness, the use of a composite based on a polyurethane (PU) matrix charged by a piezoelectric material, enable to generate a large deformation of the material, therefore harvesting more energy. This new material will provide a competitive alternative and low cost manufacturing technology of autonomous systems (smart clothes, car seat, boat sail, flag ...). A thin film of the PZT/PU composite was prepared using up to 80 vol. % of ceramic. Due to the dielectric nature of the PZT, inclusions of this one in a PU matrix raises the permittivity of the composite, on other hand this latter seems to decline at high frequencies.

  7. Broadband and wide-angle light harvesting by ultra-thin silicon solar cells with partially embedded dielectric spheres.

    PubMed

    Yang, Zhenhai; Shang, Aixue; Qin, Linling; Zhan, Yaohui; Zhang, Cheng; Gao, Pingqi; Ye, Jichun; Li, Xiaofeng

    2016-04-01

    We propose a design of crystalline silicon thin-film solar cells (c-Si TFSCs, 2 μm-thick) configured with partially embedded dielectric spheres on the light-injecting side. The intrinsic light trapping and photoconversion are simulated by the complete optoelectronic simulation. It shows that the embedding depth of the spheres provides an effective way to modulate and significantly enhance the optical absorption. Compared to the conventional planar and front sphere systems, the optimized partially embedded sphere design enables a broadband, wide-angle, and strong optical absorption and efficient carrier transportation. Optoelectronic simulation predicts that a 2 μm-thick c-Si TFSC with half-embedded spheres shows an increment of more than 10  mA/cm2 in short-circuit current density and an enhancement ratio of more than 56% in light-conversion efficiency, compared to the conventional planar counterparts.

  8. Reactive pulsed laser deposition of high-k silicon dioxide and silicon oxynitride thin films for gate-dielectric applications

    NASA Astrophysics Data System (ADS)

    Desbiens, E.; Dolbec, R.; El Khakani, M. A.

    2002-05-01

    We have successfully developed two reactive pulsed laser deposition (PLD) processes for the growth of high-k SiO2 and SiOxNy thin films. At a KrF laser intensity of 3×108 W/cm2, both SiO2 and SiOxNy films have been deposited by ablating a silicon target in a reactive gas atmosphere (O2 and O2/N2 mixture, respectively) on both Si (100) and Pt-coated Si substrates. Two key issues are presented here, namely (i) the effect of the deposition temperature (Td in the 20-450 °C range) and (ii) the effect of the N incorporation (in the 0.3-20 at. % concentration range) on the microstructure and electrical properties of PLD SiO2 and SiOxNy thin films, respectively. For the PLD-SiO2 films, 300 °C has been identified as the optimal deposition temperature that yields stoichiometric ([O]/[Si]~1.9), hydrogen-free films with a low local disorder, a highly dense microstructure and a dielectric constant (k) higher than that quoted for thermally grown SiO2. On the other hand, the PLD SiOxNy films containing 20 at. % of N have exhibited a dielectric constant as high as ~7. A rather good agreement is obtained between the k values deduced from the Poole-Frenkel emission (PFE) model and those obtained from direct impedance measurements, confirming thereby that the PFE remains the predominant conduction mechanism in the PLD SiOxNy films.

  9. Comment on: "Characterization of Microroughness Parameters in Titanium Nitride Thin Films Grown by DC Magnetron Sputtering" [J Fusion Energ DOI 10.1007/s10894-012-9510-z

    NASA Astrophysics Data System (ADS)

    Solaymani, Shahram; Ghaderi, Atefeh; Nezafat, Negin Beryani

    2012-12-01

    In recent article [Ali Gelali. Azin Ahmadpourian. Reza Bavadi. M. R. Hantehzadeh. Arman Ahmadpourian. J Fusion Energ DOI 10.1007/s10894-012-9510-z], Ali Geleli et al. studied the PSD and RMS Roughness parameters in Titanium Nitride thin films by AFM data and used the computed fractal dimension value of micrographs to describe the surface morphology of thin films. Here, the correct form of equations and relationship between PSD and RMS will be discussed.

  10. Efficient III-Nitride MIS-HEMT devices with high-κ gate dielectric for high-power switching boost converter circuits

    NASA Astrophysics Data System (ADS)

    Mohanbabu, A.; Mohankumar, N.; Godwin Raj, D.; Sarkar, Partha; Saha, Samar K.

    2017-03-01

    The paper reports the results of a systematic theoretical study on efficient recessed-gate, double-heterostructure, and normally-OFF metal-insulator-semiconductor high-electron mobility transistors (MIS-HEMTs), HfAlOx/AlGaN on Al2O3 substrate. In device architecture, a thin AlGaN layer is used in the AlGaN graded barrier MIS-HEMTs that offers an excellent enhancement-mode device operation with threshold voltage higher than 5.3 V and drain current above 0.64 A/mm along with high on-current/off-current ratio over 107 and subthreshold slope less than 73 mV/dec. In addition, a high OFF-state breakdown voltage of 1200 V is achieved for a device with a gate-to-drain distance and field-plate length of 15 μm and 5.3 μm, respectively at a drain current of 1 mA/mm with a zero gate bias, and the substrate grounded. The numerical device simulation results show that in comparison to a conventional AlGaN/GaN MIS-HEMT of similar design, a graded barrier MIS-HEMT device exhibits a better interface property, remarkable suppression of leakage current, and a significant improvement of breakdown voltage for HfAlOx gate dielectric. Finally, the benefit of HfAlOx graded-barrier AlGaN MIS-HEMTs based switching devices is evaluated on an ultra-low-loss converter circuit.

  11. Evolution of dielectric function of Al-doped ZnO thin films with thermal annealing: effect of band gap expansion and free-electron absorption.

    PubMed

    Li, X D; Chen, T P; Liu, Y; Leong, K C

    2014-09-22

    Evolution of dielectric function of Al-doped ZnO (AZO) thin films with annealing temperature is observed. It is shown that the evolution is due to the changes in both the band gap and the free-electron absorption as a result of the change of free-electron concentration of the AZO thin films. The change of the electron concentration could be attributed to the activation of Al dopant and the creation/annihilation of the donor-like defects like oxygen vacancy in the thin films caused by annealing.

  12. Origin of mobility enhancement by chemical treatment of gate-dielectric surface in organic thin-film transistors: Quantitative analyses of various limiting factors in pentacene thin films

    NASA Astrophysics Data System (ADS)

    Matsubara, R.; Sakai, Y.; Nomura, T.; Sakai, M.; Kudo, K.; Majima, Y.; Knipp, D.; Nakamura, M.

    2015-11-01

    For the better performance of organic thin-film transistors (TFTs), gate-insulator surface treatments are often applied. However, the origin of mobility increase has not been well understood because mobility-limiting factors have not been compared quantitatively. In this work, we clarify the influence of gate-insulator surface treatments in pentacene thin-film transistors on the limiting factors of mobility, i.e., size of crystal-growth domain, crystallite size, HOMO-band-edge fluctuation, and carrier transport barrier at domain boundary. We quantitatively investigated these factors for pentacene TFTs with bare, hexamethyldisilazane-treated, and polyimide-coated SiO2 layers as gate dielectrics. By applying these surface treatments, size of crystal-growth domain increases but both crystallite size and HOMO-band-edge fluctuation remain unchanged. Analyzing the experimental results, we also show that the barrier height at the boundary between crystal-growth domains is not sensitive to the treatments. The results imply that the essential increase in mobility by these surface treatments is only due to the increase in size of crystal-growth domain or the decrease in the number of energy barriers at domain boundaries in the TFT channel.

  13. Optical constants, dispersion energy parameters and dielectric properties of ultra-smooth nanocrystalline BiVO4 thin films prepared by rf-magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Sarkar, S.; Das, N. S.; Chattopadhyay, K. K.

    2014-07-01

    BiVO4 thin films have been prepared through radio frequency (rf) magnetron sputtering of a pre-fabricated BiVO4 target on ITO coated glass (ITO-glass) substrate and bare glass substrates. BiVO4 target material was prepared through solid-state reaction method by heating Bi2O3 and V2O5 mixture at 800 °C for 8 h. The films were characterized by X-ray diffraction, UV-Vis spectroscopy, LCR meter, field emission scanning electron microscopy, transmission electron microscopy and atomic force microscopy. BiVO4 thin films deposited on the ITO-glass substrate are much smoother compared to the thin films prepared on bare glass substrate. The rms surface roughness calculated from the AFM images comes out to be 0.74 nm and 4.2 nm for the films deposited on the ITO-glass substrate and bare glass substrate for the deposition time 150 min respectively. Optical constants and energy dispersion parameters of these extra-smooth BiVO4 thin films have been investigated in detail. Dielectric properties of the BiVO4 thin films on ITO-glass substrate were also investigated. The frequency dependence of dielectric constant of the BiVO4 thin films has been measured in the frequency range from 20 Hz to 2 MHz. It was found that the dielectric constant increased from 145 to 343 at 20 Hz as the film thickness increased from 90 nm to 145 nm (deposition time increased from 60 min to 150 min). It shows higher dielectric constant compared to the literature value of BiVO4.

  14. Piezoelectric and Dielectric Properties of Multilayered BaTiO3/(Ba,Ca)TiO3/CaTiO3 Thin Films.

    PubMed

    Zhu, Xiao Na; Gao, Ting Ting; Xu, Xing; Liang, Wei Zheng; Lin, Yuan; Chen, Chonglin; Chen, Xiang Ming

    2016-08-31

    Highly oriented multilayered BaTiO3-(Ba,Ca)TiO3-CaTiO3 thin films were fabricated on Nb-doped (001) SrTiO3 (Nb:STO) substrates by pulsed laser deposition. The configurations of multilayered BaTiO3-(Ba,Ca)TiO3-CaTiO3 thin films are designed with the thickness ratio of 1:1:1 and 2:1:1 and total thickness ∼300 nm. Microstructural characterization by X-ray diffraction indicates that the as-deposited thin films are highly c-axis oriented and large in-plane strain is determined in BaTiO3 and CaTiO3 layers. Piezoresponse force microscopy (PFM) studies reveal an intense in-plane polarization component, whereas the out-of-plane shows inferior phase contrast. The optimized combination is found to be the BaTiO3-(Ba0.85Ca0.15)TiO3-CaTiO3 structure with combination ratio 2:1:1, which displays the largest domain switching amplitude under DC electric field, the largest room-temperature dielectric constant ∼646, a small dielectric loss of 0.03, and the largest dielectric tunability of ∼50% at 400 kV/cm. These results suggest that the enhanced dielectric and tunability performance are greatly associated with the large in-plane polarization component and domain switching.

  15. Effect of phase transformation on optical and dielectric properties of pulsed laser deposited ZnTiO3 thin films

    NASA Astrophysics Data System (ADS)

    Jain, Praveen K.; Salim, Mohammad; Kaur, Davinder

    2016-04-01

    Zinc titanate (ZnTiO3) ceramics were prepared by conventional solid state reaction method using ZnO and TiO2 in a molar ratio of 1:1 with optimized parameters. It was found that the sample sintered at 800 °C for 12 h exhibit single hexagonal phase of ZnTiO3. ZnTiO3 thin film have been deposited on ITO coated glass substrate using pulsed laser deposition (PLD) technique employing a KrF laser source (λ = 248 nm). In present work, the effect of substrate temperature, which leads to transformation of hexagonal phase to cubic phase, has been studied. The XRD pattern revealed that pure hexagonal phase of ZnTiO3 appear upto 400 °C and more increment in substrate temperature leads to transformation of hexagonal phase to cubic phase. We have observed the blue shift in absorption edge at lower temperature. When the substrate temperature increases from 300 to 400 °C the band gap decreases due to strong hexagonal phase, but more increment in substrate temperature increases the band gap causes by change of phase from hexagonal to cubic. The dielectric constant of ZnTiO3 thin film increases as the substrate temperature increases due to the enhancement in crystallinity and improved morphology.

  16. Uncorrelated multiple conductive filament nucleation and rupture in ultra-thin high-κ dielectric based resistive random access memory

    NASA Astrophysics Data System (ADS)

    Wu, Xing; Li, Kun; Raghavan, Nagarajan; Bosman, Michel; Wang, Qing-Xiao; Cha, Dongkyu; Zhang, Xi-Xiang; Pey, Kin-Leong

    2011-08-01

    Resistive switching in transition metal oxides could form the basis for next-generation non-volatile memory (NVM). It has been reported that the current in the high-conductivity state of several technologically relevant oxide materials flows through localized filaments, but these filaments have been characterized only individually, limiting our understanding of the possibility of multiple conductive filaments nucleation and rupture and the correlation kinetics of their evolution. In this study, direct visualization of uncorrelated multiple conductive filaments in ultra-thin HfO2-based high-κ dielectric resistive random access memory (RRAM) device has been achieved by high-resolution transmission electron microscopy (HRTEM), along with electron energy loss spectroscopy (EELS), for nanoscale chemical analysis. The locations of these multiple filaments are found to be spatially uncorrelated. The evolution of these microstructural changes and chemical properties of these filaments will provide a fundamental understanding of the switching mechanism for RRAM in thin oxide films and pave way for the investigation into improving the stability and scalability of switching memory devices.

  17. Origin of soft-mode stiffening and reduced dielectric response in SrTiO3 thin films

    NASA Astrophysics Data System (ADS)

    Ostapchuk, T.; Petzelt, J.; Železný, V.; Pashkin, A.; Pokorný, J.; Drbohlav, I.; Kužel, R.; Rafaja, D.; Gorshunov, B. P.; Dressel, M.; Ohly, Ch.; Hoffmann-Eifert, S.; Waser, R.

    2002-12-01

    The problem of the reduced dielectric response in thin films of high-permittivity materials is analyzed by studying the soft-mode response in several SrTiO3 thin films by means of Fourier transform far infrared, monochromatic submillimeter, and micro-Raman spectroscopies. A 300-nm-thick metalorganic chemical vapor deposition film, quasiepitaxially grown on a (0001) sapphire substrate with a perfect <111> orientation, displays a ferroelectric transition near 125 K induced by a tensile residual stress, appearing apparently simultaneously with the antiferrodistortive transition. On the other hand, polycrystalline chemical solution deposition films grown on (0001) sapphire, and also tensile stressed, show a harder soft mode response without the appearance of macroscopic ferroelectricity. This effect, which increases with the film thickness, is explained by a strong depolarizing field induced by the percolated porosity and cracks (in the 10-nm scale) along the boundaries of columnar grains (normal to the probe field direction). Brick-wall model calculations showed that 0.2 vol. % of such a porosity type reduces the permittivity from 30000 to less than 1000. The activation of the forbidden IR modes in the Raman spectra in the whole 80-300-K temperature range studied is explained by the effect of polar grain boundaries, in analogy with the bulk ceramics.

  18. Surface wet-ability modification of thin PECVD silicon nitride layers by 40 keV argon ion treatments

    NASA Astrophysics Data System (ADS)

    Caridi, F.; Picciotto, A.; Vanzetti, L.; Iacob, E.; Scolaro, C.

    2015-10-01

    Measurements of wet-ability of liquid drops have been performed on a 30 nm silicon nitride (Si3N4) film deposited by a PECVD reactor on a silicon wafer and implanted by 40 keV argon ions at different doses. Surface treatments by using Ar ion beams have been employed to modify the wet-ability. The chemical composition of the first Si3N4 monolayer was investigated by means of X-ray Photoelectron Spectroscopy (XPS). The surface morphology was tested by Atomic Force Microscopy (AFM). Results put in evidence the best implantation conditions for silicon nitride to increase or to reduce the wet-ability of the biological liquid. This permits to improve the biocompatibility and functionality of Si3N4. In particular experimental results show that argon ion bombardment increases the contact angle, enhances the oxygen content and increases the surface roughness.

  19. Multifunctional Hybrid Multilayer Gate Dielectrics with Tunable Surface Energy for Ultralow-Power Organic and Amorphous Oxide Thin-Film Transistors.

    PubMed

    Byun, Hye-Ran; You, Eun-Ah; Ha, Young-Geun

    2017-03-01

    For large-area, printable, and flexible electronic applications using advanced semiconductors, novel dielectric materials with excellent capacitance, insulating property, thermal stability, and mechanical flexibility need to be developed to achieve high-performance, ultralow-voltage operation of thin-film transistors (TFTs). In this work, we first report on the facile fabrication of multifunctional hybrid multilayer gate dielectrics with tunable surface energy via a low-temperature solution-process to produce ultralow-voltage organic and amorphous oxide TFTs. The hybrid multilayer dielectric materials are constructed by iteratively stacking bifunctional phosphonic acid-based self-assembled monolayers combined with ultrathin high-k oxide layers. The nanoscopic thickness-controllable hybrid dielectrics exhibit the superior capacitance (up to 970 nF/cm(2)), insulating property (leakage current densities <10(-7) A/cm(2)), and thermal stability (up to 300 °C) as well as smooth surfaces (root-mean-square roughness <0.35 nm). In addition, the surface energy of the hybrid multilayer dielectrics are easily changed by switching between mono- and bifunctional phosphonic acid-based self-assembled monolayers for compatible fabrication with both organic and amorphous oxide semiconductors. Consequently, the hybrid multilayer dielectrics integrated into TFTs reveal their excellent dielectric functions to achieve high-performance, ultralow-voltage operation (< ± 2 V) for both organic and amorphous oxide TFTs. Because of the easily tunable surface energy, the multifunctional hybrid multilayer dielectrics can also be adapted for various organic and inorganic semiconductors, and metal gates in other device configurations, thus allowing diverse advanced electronic applications including ultralow-power and large-area electronic devices.

  20. Interference effects in the UV(VUV)-excited luminescence spectroscopy of thin dielectric films.

    PubMed

    Buntov, Evgeny; Zatsepin, Anatoly

    2013-05-01

    The problem of exciting UV and VUV light interference affecting experimental photoluminescence excitation spectra is analysed for the case of thin transparent films containing arbitrarily distributed emission centres. A numerical technique and supplied software aimed at modelling the phenomenon and correcting the distorted spectra are proposed. Successful restoration results of the experimental synchrotron data for ion-implanted silica films show that the suggested method has high potential.

  1. Sol-Gel Processing of Low Dielectric Constant Nanoporous Silica Thin Films

    DTIC Science & Technology

    2001-11-01

    under the influence of attractive van der Waals forces. Spin coating has been used to deposit the porous thin silica films on desired substrates. This...for spin coating using a Model PC 101 spinner by Headway Research, Inc. All the wafers were used as-received without any pretreatment process... spin coating . Spin coating did not start until the solution reached the about-to-gel point, approximately 6/7 of its gelation time. After spin

  2. Epitaxial growth of dielectric CaCu3Ti4O12 thin films on (001) LaAlO3 by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Lin, Y.; Chen, Y. B.; Garret, T.; Liu, S. W.; Chen, C. L.; Chen, L.; Bontchev, R. P.; Jacobson, A.; Jiang, J. C.; Meletis, E. I.; Horwitz, J.

    2002-07-01

    High dielectric CaCu3Ti4O12 (CCTO) thin films were epitaxially grown on (001) LaAlO3 (LAO) substrates by pulsed laser deposition. Microstructural studies by x-ray diffraction, pole figure measurements, and transmission electron microscopy show that the as-grown films are good single crystalline quality with an interface relationship of (001)CCTO)//(001LAO and 100]CCTO//[100LAO. Dielectric property measurements show that the films have an extremely high dielectric constant with value of 10 000 at 1 MHz at room temperature. It is interesting to note that the twinned substrate results in the formation of twinning or dislocations inside the CCTO film.

  3. Chemical nature of colossal dielectric constant of CaCu3Ti4O12 thin film by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Deng, Guochu; Xanthopoulos, Nicolas; Muralt, Paul

    2008-04-01

    Epitaxial CaCu3Ti4O12 thin films grown by pulsed laser deposition were studied in the as-deposited and oxygen annealed state. The first one exhibited the usual transition from dielectric to colossal dielectric behavior upon increasing the temperature to above 100K. This transition disappeared after annealing at 900°C in air. The two states significantly differ in their x-ray photoelectron spectra. The state of colossal dielectric constant corresponds to a bulk material with considerable amounts of Cu + and Ti3+, combined with Cu species enrichment at the surface. The annealed state exhibited a nearly stoichiometric composition with no Cu+ and Ti3+. The previously observed p-type conduction in the as-deposited state is thus related to oxygen vacancies compensated by the point defects of Cu+ and Ti3+.

  4. Superior dielectric properties for template assisted grown (100) oriented Gd{sub 2}O{sub 3} thin films on Si(100)

    SciTech Connect

    Roy Chaudhuri, Ayan Osten, H. J.; Fissel, A.

    2014-01-06

    We report about the single crystalline growth and dielectric properties of Gd{sub 2}O{sub 3}(100) thin films on Si(100) surface. Using a two step molecular beam epitaxy growth process, we demonstrate that controlled engineering of the oxide/Si interface is a key step to achieve the atypical (100) oriented growth of Gd{sub 2}O{sub 3}. Unusually, high dielectric constant values (∼23–27) were extracted from capacitance voltage measurements. Such effect can be understood in terms of a two dimensional charge layer at the Gd{sub 2}O{sub 3}/Si interface (W. Sitaputra and R. Tsu, Appl. Phys. Lett. 101, 222903 (2012)) which can influence the dielectric properties of the oxide layer by forming an additional negative quantum capacitance.

  5. Dangling bond energetics in carbon nitride and phosphorus carbide thin films with fullerene-like and amorphous structure

    NASA Astrophysics Data System (ADS)

    Gueorguiev, G. K.; Broitman, E.; Furlan, A.; Stafström, S.; Hultman, L.

    2009-11-01

    The energy cost for dangling bond formation in Fullerene-like Carbon Nitride (FL-CN x) and Phosphorus carbide (FL-CP x) as well as their amorphous counterparts: a-CN x, a-CP x, and a-C has been calculated within the framework of Density Functional Theory and compared with surface water adsorption measurements. The highest energy cost is found in the FL-CN x (about 1.37 eV) followed by FL-CP x compounds (0.62-1.04 eV).

  6. Effects of Ta incorporation in Y2O3 gate dielectric of InGaZnO thin-film transistor

    NASA Astrophysics Data System (ADS)

    Song, J. Q.; Qian, L. X.; Lai, P. T.

    2016-10-01

    The effects of Ta incorporation in Y2O3 gate dielectric on the electrical characteristics of InGaZnO thin-film transistor are investigated. With an appropriate Ta content in the Y2O3 gate dielectric, the saturation mobility of the thin-film transistor can be significantly increased, about three times that of the control sample with Y2O3 gate dielectric. Accordingly, the sample with a Ta/Ta+Y ratio of 68.6% presents a high saturation mobility of 33.5 cm2 V-1 s-1, low threshold voltage of 2.0 V, large on/off current ratio of 2.8 × 107, and suppressed hysteresis. This can be attributed to the fact that the Ta incorporation can suppress the hygroscopicity of Y2O3 and thus reduces the Y2O3/InGaZnO interface roughness and also the traps at/near the interface, as supported by atomic force microscopy and low-frequency noise measurement, respectively. However, excessive Ta incorporation in the Y2O3 gate dielectric leads to degradation in device performance because Ta-related defects are generated.

  7. Ferroelectric/Dielectric Double Gate Insulator Spin-Coated Using Barium Titanate Nanocrystals for an Indium Oxide Nanocrystal-Based Thin-Film Transistor.

    PubMed

    Pham, Hien Thu; Yang, Jin Ho; Lee, Don-Sung; Lee, Byoung Hun; Jeong, Hyun-Dam

    2016-03-23

    Barium titanate nanocrystals (BT NCs) were prepared under solvothermal conditions at 200 °C for 24 h. The shape of the BT NCs was tuned from nanodot to nanocube upon changing the polarity of the alcohol solvent, varying the nanosize in the range of 14-22 nm. Oleic acid-passivated NCs showed good solubility in a nonpolar solvent. The effect of size and shape of the BT NCs on the ferroelectric properties was also studied. The maximum polarization value of 7.2 μC/cm(2) was obtained for the BT-5 NC thin film. Dielectric measurements of the films showed comparable dielectric constant values of BT NCs over 1-100 kHz without significant loss. Furthermore, the bottom gate In2O3 NC thin film transistors exhibited outstanding device performance with a field-effect mobility of 11.1 cm(2) V(-1) s(-1) at a low applied gate voltage with BT-5 NC/SiO2 as the gate dielectric. The low-density trapped state was observed at the interface between the In2O3 NC semiconductor and the BT-5 NCs/SiO2 dielectric film. Furthermore, compensation of the applied gate field by an electric dipole-induced dipole field within the BT-5 NC film was also observed.

  8. Optical properties and dielectric relaxation of polyvinylidene fluoride thin films doped with gadolinium chloride

    NASA Astrophysics Data System (ADS)

    El-Sayed, Somyia

    2014-12-01

    In this study, the properties of pure and GdCl3-doped polyvinylidene fluoride (PVDF) films were investigated. X-ray diffraction revealed that the PVDF was composed of mixed α and β phases. Adding GdCl3 to PVDF decreased the crystallinity of the polymer matrix. At room temperature, in the ultraviolet-visible range both the absorbance (a) and extinction coefficient (k) of PVDF decreased with GdCl3 content, demonstrating that the optical response of the doped films improved because of increasing optical energy gap (Eg). We also measured the dielectric loss (ɛ″), electric modulus (M″), and ac conductivity (σac) at 300-450 K and 0.1-3000 kHz. The pure and doped PVDF exhibited different relaxation processes. The activation energy (Ea) of the αc relaxation decreased with increasing GdCl3 content, following an Arrhenius relationship. The behavior of the ac conductivity revealed that the conduction mechanism for studied films followed correlated barrier hopping model. The hopping distance (R) was calculated at different temperatures for all investigated samples.

  9. Dielectric characterization of multiferroic magnetoelectric double-perovskite Y(Ni0.5Mn0.5)O3 thin films

    NASA Astrophysics Data System (ADS)

    Coy, L. E.; Fina, I.; Ventura, J.; Yate, L.; Langenberg, E.; Polo, M. C.; Ferrater, C.; Varela, M.

    2016-10-01

    We report on the functional properties of the Y(Ni0.5Mn0.5)O3 epitaxial thin films, growth by pulsed laser deposition, observing the clear features of their ferroelectric and ferromagnetic nature at cryogenic temperature. The characterization of temperature-dependent complex impedance spectroscopy has shown a dielectric anomaly around the ferromagnetic Curie temperature (≈100 K) indicative of coupling between magnetic and electric orders.

  10. The structural and in-plane dielectric/ferroelectric properties of the epitaxial (Ba, Sr)(Zr, Ti)O{sub 3} thin films

    SciTech Connect

    Chan, N. Y. Wang, Y.; Chan, H. L. W.; Wang, D. Y.; Dai, J. Y.

    2014-06-21

    Epitaxial (Ba{sub 1-x}Sr{sub x})(Zr{sub 0.1}Ti{sub 0.9})O{sub 3} (BSZT, x = 0 – 0.45) thin films were deposited on (LaAlO{sub 3}){sub 0.3}(Sr{sub 2}AlTaO{sub 6}){sub 0.35} (LSAT) substrates by pulsed laser deposition. The experimental results demonstrate that the structural, dielectric, and ferroelectric properties of the BSZT thin films were greatly dependent on the strontium content. The BSZT thin films transformed from tetragonal to cubic phase when x ≥ 0.35 at room temperature. The Curie temperature and room-temperature remnant polarization decrease with increasing strontium concentration. The optimal dielectric properties were found in (Ba{sub 0.55}Sr{sub 0.45})(Zr{sub 0.1}Ti{sub 0.9})O{sub 3} thin films which is in paraelectric state, having tunability of 47% and loss tangent of 0.0338 under an electric field of 20 MV/m at 1 MHz. This suggests that BSZT thin film is a promising candidate for tunable microwave device applications.

  11. Electro-spraying and ultra-violet light curing of polydimethylsiloxane to fabricate thin films for low-voltage dielectric elastomer actuators

    NASA Astrophysics Data System (ADS)

    Weiss, Florian M.; Kovacs, Gabor; Töpper, Tino; Osmani, Bekim; Leung, Vanessa Y. F.; Müller, Bert

    2016-04-01

    Currently, dielectric elastomer actuators (DEA) are mainly based on micrometer-thin polymer films and require operating voltages of several hundred volts. In medical applications, however, voltages as low as a few tens of volts are required. To this end, we prepared nanometer-thin dielectric elastomer layers. It is demonstrated that alternating current, electro-spray deposition allows for the fabrication of homogenous, flat, nanometer-thin polydimethylsiloxane (PDMS) films. The growth of the PDMS with average number molecular weights ranging from 800 to 62,700 g/mol, at a constant flow rate of 267 nL/s, was in situ monitored by means of spectroscopic ellipsometry. The Cauchy layer model used for data interpretation may only be applied to flat PDMS layers. Thus, in the present study the droplet morphology was also determined by atomic force microscopy. Spectroscopic ellipsometry does allow for the qualitative determination of the thin film morphology. However, for high molecular weight polymers the precise measurement during deposition is challenging. Independent of the molecular weight, the roughness of the deposited PDMS films considerably smoothens during the ultra-violet radiation treatment. After curing, the electro-sprayed nanometer-thin PDMS films are homogeneous enough to qualify for the fabrication of low-voltage DEA.

  12. Passivation of Si and a-Si:H surfaces by thin oxide and oxy-nitride layers

    NASA Astrophysics Data System (ADS)

    Pinčík, E.; Kobayashi, H.; Rusnák, J.; Takahashi, M.; Brunner, R.; Jergel, M.; Morales-Acevedo, A.; Ortega, L.; Kákoš, J.

    2006-08-01

    An aim of the contribution is focused predominantly on investigation of electrical interface properties of MIS structures consisting of silicon-based substrates, which were passivated by 1.5-12 nm silicon dioxide, silicon nitride and/or silicon oxy-nitride layers. Substrates of different structural properties were used—crystalline Si (c-Si), amorphous hydrogenated silicon (a-Si:H), and silicon layer deposited by plasma enhanced chemical vapor deposition (PECVD). A stress was laid upon structures prepared on n moderately doped c-Si. The paper presents also changes of structural properties of a-Si:H surface after Ar low energy beam impact. For the first time we are presenting important results concerning utilization of X-ray diffraction with β filter in investigation of a-Si:H cluster structure. Considerable part of the contribution is devoted to investigation of electrical properties of Al/Si 3N 4/Si (2-3 nm)/GaAs structures with aim to clarify the particular effect of the ultrathin Si interlayer in the structure. Our observations indicate that the silicon interlayer can act as delta doping of GaAs and/or as quantum well. Therefore, the experimental results are compared and discussed with calculated ones obtained by application of our theoretical description of electron emission of quantum well.

  13. Influence of annealing temperature on the dielectric properties of BaSrTiO3 thin films deposited on various substrates

    NASA Astrophysics Data System (ADS)

    Lee, Chil-Hyoung; Oh, Young-Jei; Lee, Deuk Yong; Choi, Doo-Jin

    2016-11-01

    (Ba0.5Sr0.5)TiO3 (BST) thin films were deposited on various substrates, such as LaAlO3(100), MgO(100), R-plane sapphire[1012], and polycrystalline sapphire, by using RF magnetron sputtering to investigate the influence of annealing temperature on the dielectric properties and the tunability of the films. The BST thin films deposited on LaAlO3(100) exhibited a high tunability of 42 % and a low dielectric loss of 0.004 due to the small differences in the lattice parameters and the thermal expansion coefficients between the BST films and the substrates. In contrast, the BST films deposited on a polycrystalline sapphire, exhibiting a relatively high mismatch factor, showed the tunability of 24 % and a dielectric loss of 0.007. The BST thin films on LaAlO3(100), MgO(100), R-plane sapphire[1012], and polycrystalline sapphire were annealed. The optimized annealing temperatures were found to be 950 °C, 1050 °C, 1100 °C, and 1150 °C, respectively. The difference in annealing temperature is likely due to the differences in the lattice parameters and the thermal expansion coefficients between the films and the substrates.

  14. Scattering effect of the high-index dielectric nanospheres for high performance hydrogenated amorphous silicon thin-film solar cells

    NASA Astrophysics Data System (ADS)

    Yang, Zhenhai; Gao, Pingqi; Zhang, Cheng; Li, Xiaofeng; Ye, Jichun

    2016-07-01

    Dielectric nanosphere arrays are considered as promising light-trapping designs with the capability of transforming the freely propagated sunlight into guided modes. This kinds of designs are especially beneficial to the ultrathin hydrogenated amorphous silicon (a-Si:H) solar cells due to the advantages of using lossless material and easily scalable assembly. In this paper, we demonstrate numerically that the front-sided integration of high-index subwavelength titanium dioxide (TiO2) nanosphere arrays can significantly enhance the light absorption in 100 nm-thick a-Si:H thin films and thus the power conversion efficiencies (PCEs) of related solar cells. The main reason behind is firmly attributed to the strong scattering effect excited by TiO2 nanospheres in the whole waveband, which contributes to coupling the light into a-Si:H layer via two typical ways: 1) in the short-waveband, the forward scattering of TiO2 nanospheres excite the Mie resonance, which focuses the light into the surface of the a-Si:H layer and thus provides a leaky channel; 2) in the long-waveband, the transverse waveguided modes caused by powerful scattering effectively couple the light into almost the whole active layer. Moreover, the finite-element simulations demonstrate that photocurrent density (Jph) can be up to 15.01 mA/cm2, which is 48.76% higher than that of flat system.

  15. Scattering effect of the high-index dielectric nanospheres for high performance hydrogenated amorphous silicon thin-film solar cells

    PubMed Central

    Yang, Zhenhai; Gao, Pingqi; Zhang, Cheng; Li, Xiaofeng; Ye, Jichun

    2016-01-01

    Dielectric nanosphere arrays are considered as promising light-trapping designs with the capability of transforming the freely propagated sunlight into guided modes. This kinds of designs are especially beneficial to the ultrathin hydrogenated amorphous silicon (a-Si:H) solar cells due to the advantages of using lossless material and easily scalable assembly. In this paper, we demonstrate numerically that the front-sided integration of high-index subwavelength titanium dioxide (TiO2) nanosphere arrays can significantly enhance the light absorption in 100 nm-thick a-Si:H thin films and thus the power conversion efficiencies (PCEs) of related solar cells. The main reason behind is firmly attributed to the strong scattering effect excited by TiO2 nanospheres in the whole waveband, which contributes to coupling the light into a-Si:H layer via two typical ways: 1) in the short-waveband, the forward scattering of TiO2 nanospheres excite the Mie resonance, which focuses the light into the surface of the a-Si:H layer and thus provides a leaky channel; 2) in the long-waveband, the transverse waveguided modes caused by powerful scattering effectively couple the light into almost the whole active layer. Moreover, the finite-element simulations demonstrate that photocurrent density (Jph) can be up to 15.01 mA/cm2, which is 48.76% higher than that of flat system. PMID:27455911

  16. Scattering effect of the high-index dielectric nanospheres for high performance hydrogenated amorphous silicon thin-film solar cells.

    PubMed

    Yang, Zhenhai; Gao, Pingqi; Zhang, Cheng; Li, Xiaofeng; Ye, Jichun

    2016-07-26

    Dielectric nanosphere arrays are considered as promising light-trapping designs with the capability of transforming the freely propagated sunlight into guided modes. This kinds of designs are especially beneficial to the ultrathin hydrogenated amorphous silicon (a-Si:H) solar cells due to the advantages of using lossless material and easily scalable assembly. In this paper, we demonstrate numerically that the front-sided integration of high-index subwavelength titanium dioxide (TiO2) nanosphere arrays can significantly enhance the light absorption in 100 nm-thick a-Si:H thin films and thus the power conversion efficiencies (PCEs) of related solar cells. The main reason behind is firmly attributed to the strong scattering effect excited by TiO2 nanospheres in the whole waveband, which contributes to coupling the light into a-Si:H layer via two typical ways: 1) in the short-waveband, the forward scattering of TiO2 nanospheres excite the Mie resonance, which focuses the light into the surface of the a-Si:H layer and thus provides a leaky channel; 2) in the long-waveband, the transverse waveguided modes caused by powerful scattering effectively couple the light into almost the whole active layer. Moreover, the finite-element simulations demonstrate that photocurrent density (Jph) can be up to 15.01 mA/cm(2), which is 48.76% higher than that of flat system.

  17. Technology and characterization of Thin-Film Transistors (TFTs) with a-IGZO semiconductor and high-k dielectric layer

    NASA Astrophysics Data System (ADS)

    Mroczyński, R.; Wachnicki, Ł.; Gierałtowska, S.

    2016-12-01

    In this work, we present the design of the technology and fabrication of TFTs with amorphous IGZO semiconductor and high-k gate dielectric layer in the form of hafnium oxide (HfOx). In the course of this work, the IGZO fabrication was optimized by means of Taguchi orthogonal tables approach in order to obtain an active semiconductor with reasonable high concentration of charge carriers, low roughness and relatively high mobility. The obtained Thin-Film Transistors can be characterized by very good electrical parameters, i.e., the effective mobility (μeff ≍ 12.8 cm2V-1s-1) significantly higher than that for a-Si TFTs (μeff ≍ 1 cm2V-1s-1). However, the value of sub-threshold swing (i.e., 640 mV/dec) points that the interfacial properties of IGZO/HfOx stack is characterized by high value of interface states density (Dit) which, in turn, demands further optimization for future applications of the demonstrated TFT structures.

  18. Corrosion in low dielectric constant Si-O based thin films: Buffer concentration effects

    SciTech Connect

    Zeng, F. W.; Lane, M. W.; Gates, S. M.

    2014-05-15

    Organosilicate glass (OSG) is often used as an interlayer dielectric (ILD) in high performance integrated circuits. OSG is a brittle material and prone to stress-corrosion cracking reminiscent of that observed in bulk glasses. Of particular concern are chemical-mechanical planarization techniques and wet cleans involving solvents commonly encountered in microelectronics fabrication where the organosilicate film is exposed to aqueous environments. Previous work has focused on the effect of pH, surfactant, and peroxide concentration on the subcritical crack growth of these films. However, little or no attention has focused on the effect of the conjugate acid/base concentration in a buffer. Accordingly, this work examines the “strength” of the buffer solution in both acidic and basic environments. The concentration of the buffer components is varied keeping the ratio of acid/base and therefore pH constant. In addition, the pH was varied by altering the acid/base ratio to ascertain any additional effect of pH. Corrosion tests were conducted with double-cantilever beam fracture mechanics specimens and fracture paths were verified with ATR-FTIR. Shifts in the threshold fracture energy, the lowest energy required for bond rupture in the given environment, G{sub TH}, were found to shift to lower values as the concentration of the base in the buffer increased. This effect was found to be much larger than the effect of the hydroxide ion concentration in unbuffered solutions. The results are rationalized in terms of the salient chemical bond breaking process occurring at the crack tip and modeled in terms of the chemical potential of the reactive species.

  19. Corrosion in low dielectric constant Si-O based thin films: Buffer concentration effects

    NASA Astrophysics Data System (ADS)

    Zeng, F. W.; Gates, S. M.; Lane, M. W.

    2014-05-01

    Organosilicate glass (OSG) is often used as an interlayer dielectric (ILD) in high performance integrated circuits. OSG is a brittle material and prone to stress-corrosion cracking reminiscent of that observed in bulk glasses. Of particular concern are chemical-mechanical planarization techniques and wet cleans involving solvents commonly encountered in microelectronics fabrication where the organosilicate film is exposed to aqueous environments. Previous work has focused on the effect of pH, surfactant, and peroxide concentration on the subcritical crack growth of these films. However, little or no attention has focused on the effect of the conjugate acid/base concentration in a buffer. Accordingly, this work examines the "strength" of the buffer solution in both acidic and basic environments. The concentration of the buffer components is varied keeping the ratio of acid/base and therefore pH constant. In addition, the pH was varied by altering the acid/base ratio to ascertain any additional effect of pH. Corrosion tests were conducted with double-cantilever beam fracture mechanics specimens and fracture paths were verified with ATR-FTIR. Shifts in the threshold fracture energy, the lowest energy required for bond rupture in the given environment, GTH, were found to shift to lower values as the concentration of the base in the buffer increased. This effect was found to be much larger than the effect of the hydroxide ion concentration in unbuffered solutions. The results are rationalized in terms of the salient chemical bond breaking process occurring at the crack tip and modeled in terms of the chemical potential of the reactive species.

  20. The impact of multilayer periodicity on texture, morphology, chemical stability and machining performance of titanium aluminum nitride/chromium nitride thin films

    NASA Astrophysics Data System (ADS)

    Delisle, Dale Andrew

    Multilayer thin films of TiAlN/CrN were deposited at varying bilayer periods (λ = 2, 4, 8 and 16 nm), along with a co-deposited (TiAlCr)N film and constituent TiAlN and CrN films, on both [111] silicon substrates and WC-4wt% Co inserts with an ISO SPGN 120308 geometry. The effects of periodicity on grain structure, texture, surface morphology, and roughness were examined, with characterization performed using electron microscopy, atomic force microscopy and x-ray diffraction analysis. An in-air constant temperature oxidation study was also performed at 650 thru 1050°C with stacked XRD line profiles and SEM used to identify the onset and extent of oxidation, respectively. Finally, dry high speed flank wear tool life experiments were completed against A2 tool steel, with the impact of the multilayer period reported in ISO standard wear vs. cutting time format. Machining results were connected back to the previously identified changes in structure. All films exhibited a rocksalt B1-type structure with a columnar morphology and lateral coarsening during film growth; which was more pronounced in the multilayer films with smaller bilayer periods. The surface morphology was found to be dependent on period; exhibiting sharp pyramidal surface features at λ = 2 nm and an increase in secondary faceting with increasing periodicity. Nearly rounded column tops result at λ = 16 nm. Surface roughness measurements showed an increasing roughness with decreasing bilayer period and pole figures revealed a small [111] texture component perpendicular to the sample surface in the 2 and 4 nm period films, with the distribution of [111] poles becoming nearly random for the films with larger periodicities (8 and 16 nm). Preferential [200] poles begin approximately 15° tilted away from the substrate normal while further increase in period results in a decrease in the off axis angle. The effect of multilayer period on the surface morphology is explained using an energetic argument

  1. Comparing plasmonic and dielectric gratings for absorption enhancement in thin-film organic solar cells.

    PubMed

    Le, Khai Q; Abass, Aimi; Maes, Bjorn; Bienstman, Peter; Alù, Andrea

    2012-01-02

    We theoretically investigate and compare the influence of square silver gratings and one-dimensional photonic crystal (1D PC) based nanostructures on the light absorption of organic solar cells with a thin active layer. We show that, by integrating the grating inside the active layer, excited localized surface plasmon modes may cause strong field enhancement at the interface between the grating and the active layer, which results in broadband absorption enhancement of up to 23.4%. Apart from using silver gratings, we show that patterning a 1D PC on top of the device may also result in a comparable broadband absorption enhancement of 18.9%. The enhancement is due to light scattering of the 1D PC, coupling the incoming light into 1D PC Bloch and surface plasmon resonance modes.

  2. Atomically modified thin interface in metal-dielectric hetero-integrated systems: control of electronic properties.

    PubMed

    Iida, Kenji; Nobusada, Katsuyuki

    2017-04-12

    We have performed first-principles studies of the electronic properties of Cu-diamond hetero-integrated systems, particularly placing emphasis on elucidating the effects of surface modification of diamond with H or O. It is found that the electronic properties crucially depend on the chemical compositions of the modified atomically thin interface region. The local density of states (LDOS) of the H-terminated diamond moiety near the Cu surface exhibits a clearly different distribution from that near the vacuum region, whereas the LDOS of the O-terminated diamond is almost independent of the Cu deposition. In other words, the effects of the electronic interactions between Cu and diamond on the electronic properties in the interface region are readily controlled by surface modification with only one atomic (i.e. H or O) layer. Electric field (EF) effects on the Cu-diamond systems also strongly depend on the electronic details, i.e. atomistic modification in the interface regions. In particular, at the interface between the H-terminated diamond moiety and the vacuum region, its conduction band energy is strongly affected by an applied EF much more than the valence band energy; that is, the band gap can be varied with an applied EF. The band gap variation is found to be attributed to an atomistic level difference in the spatial extension of the valence and conduction bands and thus is not explained with a macroscopic band diagram model. It has been demonstrated that the electronic properties of hetero-integrated systems are described and controlled well by carefully designing atomically thin interface regions.

  3. Atomically modified thin interface in metal-dielectric hetero-integrated systems: control of electronic properties

    NASA Astrophysics Data System (ADS)

    Iida, Kenji; Nobusada, Katsuyuki

    2017-04-01

    We have performed first-principles studies of the electronic properties of Cu-diamond hetero-integrated systems, particularly placing emphasis on elucidating the effects of surface modification of diamond with H or O. It is found that the electronic properties crucially depend on the chemical compositions of the modified atomically thin interface region. The local density of states (LDOS) of the H-terminated diamond moiety near the Cu surface exhibits a clearly different distribution from that near the vacuum region, whereas the LDOS of the O-terminated diamond is almost independent of the Cu deposition. In other words, the effects of the electronic interactions between Cu and diamond on the electronic properties in the interface region are readily controlled by surface modification with only one atomic (i.e. H or O) layer. Electric field (EF) effects on the Cu-diamond systems also strongly depend on the electronic details, i.e. atomistic modification in the interface regions. In particular, at the interface between the H-terminated diamond moiety and the vacuum region, its conduction band energy is strongly affected by an applied EF much more than the valence band energy; that is, the band gap can be varied with an applied EF. The band gap variation is found to be attributed to an atomistic level difference in the spatial extension of the valence and conduction bands and thus is not explained with a macroscopic band diagram model. It has been demonstrated that the electronic properties of hetero-integrated systems are described and controlled well by carefully designing atomically thin interface regions.

  4. Development of a UV extended real time spectroscopic ellipsometer and its use for characterization of boron nitride thin films

    NASA Astrophysics Data System (ADS)

    Zapien, Juan Antonio

    A rotating polarizer multichannel ellipsometer has been optimized for operation well into the ultraviolet (uv) spectral range. With this instrument, 132 spectral points in the ellipsometric parameters (psi, Delta) over the photon energy range from 1.5 eV (827 nm) to 6.5 eV (191 nm) can be collected in a minimum acquisition time of 24.5 ms, corresponding to one optical cycle of the rotating polarizer. Averages over two and eighty optical cycles (obtained in 49 ms and 1.96 s, respectively) give standard deviations in (psi, Delta) less than (0.04°, 0.08°) and (0.007°, 0.015°) respectively, for the energy range from 3.5 to 6.0 eV, as determined from successive measurements of a stable thermally oxidized silicon wafer. The key modifications that enable the extended spectral range include (i) a tandem in-line Xe/D2 source configuration, (ii) MgF2 Rochon polarizers, (iii) a spectrograph with a grating blazed at 250 nm and two stages of internally-mounted order-sorting filters, and (iv) non-uniform grouping of the pixels of the photodiode array detector. These modifications can be readily incorporated in other real time ellipsometer designs, including the rotating compensator and dual rotating compensator. The new instrument is well suited for real time characterization of wide band gap materials including boron nitride (BN), amorphous silicon oxy nitrides (a-SiOxNy), tantalum oxide (Ta2O5) among others. As an example of the application of this instrument, results of real time spectroscopic ellipsometry studies are reported for the deposition of boron nitride films grown by reactive magnetron sputtering from targets of BN and boron carbide. With the aid of the extended spectral range, crystallographic phase determination of the layered structure of the BN films has been possible. We have study the effect of deposition conditions on the nucleation of cBN and its optical properties.

  5. All 2D, high mobility, flexible, transparent thin film transistor

    DOEpatents

    Das, Saptarshi; Sumant, Anirudha V.; Roelofs, Andreas

    2017-01-17

    A two-dimensional thin film transistor and a method for manufacturing a two-dimensional thin film transistor includes layering a semiconducting channel material on a substrate, providing a first electrode material on top of the semiconducting channel material, patterning a source metal electrode and a drain metal electrode at opposite ends of the semiconducting channel material from the first electrode material, opening a window between the source metal electrode and the drain metal electrode, removing the first electrode material from the window located above the semiconducting channel material providing a gate dielectric above the semiconducting channel material, and providing a top gate above the gate dielectric, the top gate formed from a second electrode material. The semiconducting channel material is made of tungsten diselenide, the first electrode material and the second electrode material are made of graphene, and the gate dielectric is made of hexagonal boron nitride.

  6. MoS{sub 2} functionalization for ultra-thin atomic layer deposited dielectrics

    SciTech Connect

    Azcatl, Angelica; McDonnell, Stephen; Santosh, K.C.; Peng, Xin; Dong, Hong; Qin, Xiaoye; Addou, Rafik; Lu, Ning; Kim, Moon J.; Cho, Kyeongjae; Wallace, Robert M.; Mordi, Greg I.; Kim, Jiyoung

    2014-03-17

    The effect of room temperature ultraviolet-ozone (UV-O{sub 3}) exposure of MoS{sub 2} on the uniformity of subsequent atomic layer deposition of Al{sub 2}O{sub 3} is investigated. It is found that a UV-O{sub 3} pre-treatment removes adsorbed carbon contamination from the MoS{sub 2} surface and also functionalizes the MoS{sub 2} surface through the formation of a weak sulfur-oxygen bond without any evidence of molybdenum-sulfur bond disruption. This is supported by first principles density functional theory calculations which show that oxygen bonded to a surface sulfur atom while the sulfur is simultaneously back-bonded to three molybdenum atoms is a thermodynamically favorable configuration. The adsorbed oxygen increases the reactivity of MoS{sub 2} surface and provides nucleation sites for atomic layer deposition of Al{sub 2}O{sub 3}. The enhanced nucleation is found to be dependent on the thin film deposition temperature.

  7. Vertical Interface Induced Dielectric Relaxation in Nanocomposite (BaTiO3)1-x:(Sm2O3)x Thin Films

    PubMed Central

    Li, Weiwei; Zhang, Wei; Wang, Le; Gu, Junxing; Chen, Aiping; Zhao, Run; Liang, Yan; Guo, Haizhong; Tang, Rujun; Wang, Chunchang; Jin, Kuijuan; Wang, Haiyan; Yang, Hao

    2015-01-01

    Vertical interfaces in vertically aligned nanocomposite thin films have been approved to be an effective method to manipulate functionalities. However, several challenges with regard to the understanding on the physical process underlying the manipulation still remain. In this work, because of the ordered interfaces and large interfacial area, heteroepitaxial (BaTiO3)1-x:(Sm2O3)x thin films have been fabricated and used as a model system to investigate the relationship between vertical interfaces and dielectric properties. Due to a relatively large strain generated at the interfaces, vertical interfaces between BaTiO3 and Sm2O3 are revealed to become the sinks to attract oxygen vacancies. The movement of oxygen vacancies is confined at the interfaces and hampered by the misfit dislocations, which contributed to a relaxation behavior in (BaTiO3)1-x:(Sm2O3)x thin films. This work represents an approach to further understand that how interfaces influence on dielectric properties in oxide thin films. PMID:26061829

  8. Electrostatically assisted fabrication of silver-dielectric core/shell nanoparticles thin film capacitor with uniform metal nanoparticle distribution and controlled spacing.

    PubMed

    Li, Xue; Niitsoo, Olivia; Couzis, Alexander

    2016-03-01

    An electrostatically-assisted strategy for fabrication of thin film composite capacitors with controllable dielectric constant (k) has been developed. The capacitor is composed of metal-dielectric core/shell nanoparticle (silver/silica, Ag@SiO2) multilayer films, and a backfilling polymer. Compared with the simple metal particle-polymer mixtures where the metal nanoparticles (NP) are randomly dispersed in the polymer matrix, the metal volume fraction in our capacitor was significantly increased, owing to the densely packed NP multilayers formed by the electrostatically assisted assembly process. Moreover, the insulating layer of silica shell provides a potential barrier that reduces the tunneling current between neighboring Ag cores, endowing the core/shell nanocomposites with a stable and relatively high dielectric constant (k) and low dielectric loss (D). Our work also shows that the thickness of the SiO2 shell plays a dominant role in controlling the dielectric properties of the nanocomposites. Control over metal NP separation distance was realized not only by variation the shell thickness of the core/shell NPs but also by introducing a high k nanoparticle, barium strontium titanate (BST) of relatively smaller size (∼8nm) compared to 80-160nm of the core/shell Ag@SiO2 NPs. The BST assemble between the Ag@SiO2 and fill the void space between the closely packed core/shell NPs leading to significant enhancement of the dielectric constant. This electrostatically assisted assembly method is promising for generating multilayer films of a large variety of NPs over large areas at low cost.

  9. Synthesis, Properties, and Applications Of Boron Nitride

    NASA Technical Reports Server (NTRS)

    Pouch, John J.; Alterovitz, Samuel A.

    1993-01-01

    Report describes synthesis, properties, and applications of boron nitride. Especially in thin-film form. Boron nitride films useful as masks in x-ray lithography; as layers for passivation of high-speed microelectronic circuits; insulating films; hard, wear-resistant, protective films for optical components; lubricants; and radiation detectors. Present status of single-crystal growth of boron nitride indicates promising candidate for use in high-temperature semiconductor electronics.

  10. Surface band bending and band alignment of plasma enhanced atomic layer deposited dielectrics on Ga- and N-face gallium nitride

    NASA Astrophysics Data System (ADS)

    Yang, Jialing; Eller, Brianna S.; Nemanich, Robert J.

    2014-09-01

    The effects of surface pretreatment, dielectric growth, and post deposition annealing on interface electronic structure and polarization charge compensation of Ga- and N-face bulk GaN were investigated. The cleaning process consisted of an ex-situ wet chemical NH4OH treatment and an in-situ elevated temperature NH3 plasma process to remove carbon contamination, reduce oxygen coverage, and potentially passivate N-vacancy related defects. After the cleaning process, carbon contamination decreased below the x-ray photoemission spectroscopy detection limit, and the oxygen coverage stabilized at ˜1 monolayer on both Ga- and N-face GaN. In addition, Ga- and N-face GaN had an upward band bending of 0.8 ± 0.1 eV and 0.6 ± 0.1 eV, respectively, which suggested the net charge of the surface states and polarization bound charge was similar on Ga- and N-face GaN. Furthermore, three dielectrics (HfO2, Al2O3, and SiO2) were prepared by plasma-enhanced atomic layer deposition on Ga- or N-face GaN and annealed in N2 ambient to investigate the effect of the polarization charge on the interface electronic structure and band offsets. The respective valence band offsets of HfO2, Al2O3, and SiO2 with respect to Ga- and N-face GaN were 1.4 ± 0.1, 2.0 ± 0.1, and 3.2 ± 0.1 eV, regardless of dielectric thickness. The corresponding conduction band offsets were 1.0 ± 0.1, 1.3 ± 0.1, and 2.3 ± 0.1 eV, respectively. Experimental band offset results were consistent with theoretical calculations based on the charge neutrality level model. The trend of band offsets for dielectric/GaN interfaces was related to the band gap and/or the electronic part of the dielectric constant. The effect of polarization charge on band offset was apparently screened by the dielectric-GaN interface states.

  11. Structural, optical and microwave dielectric studies of Co doped MgTiO3 thin films fabricated by RF magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Santhosh Kumar, T.; Gogoi, Pallabi; Bhasaiah, S.; Raju, K. C. James; Pamu, D.

    2015-05-01

    We report the structural, optical, and microwave dielectric characteristics of (Mg0.95Co0.05)TiO3 (MCT) thin films deposited onto amorphous SiO2 (a-SiO2) substrates by RF magnetron sputtering for the first time. The role of the oxygen mixing percentage (OMP) on the growth, morphology, optical, and microwave dielectric properties of MCT thin films has been investigated. The as-deposited MCT films were x-ray amorphous and crystallined after annealing at 700 °C for 1 h in air. A preferred orientation of grains along the (110) direction has been observed with increasing OMP. Such a textured growth is explained by calculating the orientation factors from the Lotgering model. The dispersion in a refractive index with wavelength has been explained using a single oscillator dispersion model. Both the refractive index and bandgap of the films increases on annealing. The annealed films exhibit refractive indices in the range of 1.88-2.08 at 600 nm with an optical bandgap value between 3.95-4.16 eV. The increase in the refractive index is attributed to the improvement in packing density and crystallinity, and decrease in the porosity ratio, whereas the increase in bandgap is due to the decrease in intermediary energy levels within the optical bandgap. (Mg0.95Co0.05)TiO3 thin films exhibited a progressive increase in the dielectric properties with OMP and a maximum dielectric constant of ɛr = 17.3 and low loss (tanδ ˜ 1.1 × 10-3) at a spot frequency of 10 GHz for the films deposited at 75% OMP, beyond which they decreased. The improvement in dielectric properties with an increase in OMP has been correlated to the preferred orientation growth, reduction in oxygen vacancies, and strain. The prepared MCT thin films are suitable candidates for anti-reflection coatings and complementary metal-oxide semiconductor (CMOS) applications.

  12. Facile and environmentally friendly solution-processed aluminum oxide dielectric for low-temperature, high-performance oxide thin-film transistors.

    PubMed

    Xu, Wangying; Wang, Han; Xie, Fangyan; Chen, Jian; Cao, Hongtao; Xu, Jian-Bin

    2015-03-18

    We developed a facile and environmentally friendly solution-processed method for aluminum oxide (AlOx) dielectrics. The formation and properties of AlOx thin films under various annealing temperatures were intensively investigated by thermogravimetric analysis-differential scanning calorimetry (TGA-DSC), X-ray diffraction (XRD), spectroscopic ellipsometry, atomic force microscopy (AFM), attenuated total reflectance-Fourier transform infrared spectroscopy (ATR-FTIR), X-ray photoelectron spectroscopy (XPS), impedance spectroscopy, and leakage current measurements. The sol-gel-derived AlOx thin film undergoes the decomposition of organic residuals and nitrate groups, as well as conversion of aluminum hydroxides to form aluminum oxide, as the annealing temperature increases. Finally, the AlOx film is used as gate dielectric for a variety of low-temperature solution-processed oxide TFTs. Above all, the In2O3 and InZnO TFTs exhibited high average mobilities of 57.2 cm(2) V(-1) s(-1) and 10.1 cm(2) V(-1) s(-1), as well as an on/off current ratio of ∼10(5) and low operating voltages of 4 V at a maximum processing temperature of 300 °C. Therefore, the solution-processable AlOx could be a promising candidate dielectric for low-cost, low-temperature, and high-performance oxide electronics.

  13. Effect of annealing temperature on structural and electrical properties of high-κ YbTixOy gate dielectrics for InGaZnO thin film transistors

    NASA Astrophysics Data System (ADS)

    Pan, Tung-Ming; Chen, Fa-Hsyang; Hung, Meng-Ning

    2015-01-01

    This paper describes the effect of annealing temperature on the structural properties and electrical characteristics of high-κ YbTixOy gate dielectrics for indium-gallium-zinc-oxide (IGZO) thin-film transistors (TFTs). X-ray diffraction, x-ray photoelectron spectroscopy and atomic force microscopy were used to study the structural, chemical and morphological features, respectively, of these dielectric films annealed at 200, 300 and 400 °C. The YbTixOy IGZO TFT that had been annealed at 400 °C exhibited better electrical characteristics, such as a small threshold voltage of 0.53 V, a large field-effect mobility of 19.1 cm2 V-1 s-1, a high Ion/Ioff ratio of 2.8 × 107, and a low subthreshold swing of 176 mV dec.-1, relative to those of the systems that had been subjected to other annealing conditions. This result suggests that YbTixOy dielectric possesses a higher dielectric constant as well as lower oxygen vacancies (or defects) in the film. In addition, the instability of YbTixOy IGZO TFT was studied under positive gate-bias stress and negative gate-bias stress conditions.

  14. Magnetic and microstructural properties of sputter deposited Cr-doped aluminum nitride thin films on silicon substrates

    NASA Astrophysics Data System (ADS)

    Wistrela, E.; Bittner, A.; Schneider, M.; Reissner, M.; Schmid, U.

    2017-03-01

    In this paper, we report on the microstructural and magnetic properties of CrxAl1-xN thin films with Cr concentrations ranging up to x = (8.5 ± 0.5) at. %. The thin films are sputter deposited on silicon substrates and exhibit a wurtzite type microstructure verified by X-ray diffraction measurements. A vibrating sample magnetometer based measurement equipment is used to investigate magnetic properties of the Cr doped thin films in a temperature range of T = 10 K-300 K, revealing a paramagnetic behavior. With increasing temperature, the temperature independent diamagnetic contribution of the substrate material dominates the overall response characteristics. No room temperature ferromagnetism is observed for all samples investigated.

  15. The effects of the pressure and the oxygen content of the sputtering gas on the structure and the properties of zinc oxy-nitride thin films deposited by reactive sputtering of zinc

    NASA Astrophysics Data System (ADS)

    Jiang, Nanke; Georgiev, Daniel G.; Jayatissa, Ahalapitiya H.

    2013-02-01

    Zinc nitride and oxy-nitride thin films were prepared by reactive magnetron rf sputtering of zinc in either nitrogen-argon or nitrogen-argon-oxygen ambient. The effects of varying the total sputtering pressure and the oxygen fraction in the total sputtering gas mixture on the microstructure, electrical and optical properties were investigated. With increasing the sputtering pressure, the dominant phase comprising the film material changes from the crystalline zinc nitride phase to crystalline zinc oxide. The characteristic pressure, at which this change in the dominant phase is observed, decreases with the increase of the oxygen fraction in the total sputtering gas mixture. The increase of the oxygen content in the films (from 5 at.% to a maximum of 40 at.%) and the downward shift in the optical absorption edge (from 920 to 400 nm), combined with the x-ray diffraction data, support these observations, indicating the controllable fabrication of an oxy-nitride film material. Correlations between the films’ fabrication conditions, including post-deposition annealing, their structure and composition, and their electrical properties are examined as well.

  16. Optimization of Deposition Process and Microscopic Characterization of Highly Oriented Aluminum Nitride Thin Films for Bimorph Structures of Piezoelectric Tunable Capacitors

    NASA Astrophysics Data System (ADS)

    Nagano, Toshihiko; Nishigaki, Michihiko; Itaya, Kazuhiko; Kawakubo, Takashi

    2009-02-01

    Film deposition with RF sputtering to control residual stress in aluminum nitride (AlN) thin films has been investigated to fabricate the bimorph actuator for a piezoelectric tunable capacitor with low-voltage operation. The effects of conditions in sputtering and surface cleaning were studied both to obtain a preferable film orientation for piezoelectric actuation and to suppress structural deformation of the cantilever due to the residual stress in films. Microscopic analysis revealed that (0001)-oriented AlN and (111)-oriented Al films were epitaxially grown at each interface in the bimorph structure. The current-voltage (I-V) measurements showed a leakage current of less than 5 ×10-5 A m-2 in 500-nm thick AlN films up to 30 V. The effect of optimization of process parameters was demonstrated by the capacitance-voltage (C-V) characteristics of the folded-beam tunable capacitor, in which the suppression of residual stress in piezoelectric layers was shown to be effective to obtain low-voltage operation.

  17. Silicon nitride anti-reflection coating on the glass and transparent conductive oxide interface for thin film solar cells and modules

    NASA Astrophysics Data System (ADS)

    Iwahashi, T.; Morishima, M.; Fujibayashi, T.; Yang, R.; Lin, J.; Matsunaga, D.

    2015-10-01

    Anti-reflection coating (ARC) is well known as an important technique to enhance solar cell performance. Typical ARC has been applied on the glass surface to reduce light reflection loss at the air/glass interface. However, reflection loss occurs not only at glass surface but also at other interfaces such as glass/transparent conductive oxide (TCO) interface. The refractive index of SiNx is tunable from 1.6 to 2.7, and the range from 1.7 to 2.0 is suitable for ARC at glass/TCO interface. In this study, we examined the AR effect of silicon nitride (SiNx) deposited by plasma enhanced chemical vapor deposition at the glass/TCO interface with thin film silicon solar cell and module. Reflectivity reduction of 1.6% for glass/ZnO substrate has been obtained with optimal SiNx layer, which contribute 2.0% gain in cell efficiency. Besides, we also confirmed the relative efficiency gain of around 2% for large-sized solar module, leading to a world-record large area stabilized module conversion efficiency of 12.34%.

  18. Effects of bias voltage on the corrosion resistance of titanium nitride thin films fabricated by dynamic plasma immersion ion implantation-deposition

    NASA Astrophysics Data System (ADS)

    Tian, Xiubo; Fu, Ricky K. Y.; Chu, Paul K.

    2002-01-01

    Dynamic plasma-based thin-film deposition incorporating ion mixing and plasma immersion is an effective technique to synthesize nitride-based hard films. We have fabricated TiN films using a filtered titanium vacuum arc in a nitrogen plasma environment. A pulsed high voltage is applied to the target for a short time when the metallic arc is fired to attain simultaneous plasma deposition and ion mixing. We investigate the dependence of the corrosion resistance and interfacial structure of the treated samples on the applied voltage. Our Auger results reveal an oxygen-rich surface film due to the non-ultra-high-vacuum conditions and high affinity of oxygen to titanium. The corrosion current is reduced by two orders of magnitude comparing the sample processed at 8 kV to the untreated sample, but the 23 kV sample unexpectedly shows worse results. The pitting potential diminishes substantially although the corrosion current is similar to that observed in the 8 kV sample. The polarization test data are consistent with our scanning electron microscopy observation, corroborating the difference in the pitting distribution and appearance. This anomalous behavior is believed to be due to the change in the chemical composition as a result of high-energy ion bombardment.

  19. Boron nitride phosphide thin films grown on quartz substrate by hot-filament and plasma-assisted chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Zhang, X. W.; Xu, S. Y.; Han, G. R.

    2004-10-01

    Boron nitride phosphide films are, for the first time, grown on transparent quartz substrate by hot filament and radio-frequency plasma co-assisted chemical vapor deposition technique. XPS, XRD, SEM, and UV measurements are performed to study the chemical composition, crystallization, microstructure, and optical absorption, respectively. A centipede-like microstructure and undulating ground morphology on the film surface are observed, and their growth mechanism is speculated upon. The chemical composition is determined as BN1-xPx, whose characteristic XRD peak is preliminarily identified. The optical band gap can be modulated between 5.52 eV and 3.74 eV, simply by adjusting the phosphorus content in BN1-xPx through modifying the PH3 flux during the film-deposition process. The merits of the BN1-xPx film, such as high ultraviolet photoelectric sensitivity with negligible sensitivity in the visible region, modifiable wide optical band gap, and good adhesion on transparent substrate, suggest potential applications for ultraviolet photo-electronics.

  20. Remote quantitative temperature and thickness measurements of plasma-deposited titanium nitride thin coatings on steel using a laser interferometric thermoreflectance optical thermometer

    SciTech Connect

    Liu Yue; Mandelis, Andreas; Choy, Mervyn; Wang, Chinhua; Segal, Lee

    2005-08-15

    An optical thermometer based on the principle of laser thermoreflectance has been introduced to monitor the surface temperature of thin coatings on steel parts undergoing an industrial titanium nitride (TiN) alloy deposition process. To study the feasibility of the optical thermometer, various thermo-optical parameters of TiN affected by the deposition process have been investigated; namely, the reflectance-temperature relation, the thermoreflectance coefficient, and the coating thickness dependence of thermoreflectance and of total reflectance. A theory of interferometric thermoreflectance has been introduced to model the total reflectance variations during the coating process. An inverse reflectance-temperature relation for the TiN-D2 steel substrate system has been found and a first-order Taylor series expansion used to model thermoreflectance has been shown to yield a thermoreflectance coefficient which is independent of temperature. Both results are in quantitative agreement with the Drude-Zener theory of conductors and semi-conductors. An empirical formula has been derived to effectively model the experimental thermoreflectance coefficient dependence of the TiN-D2 steel system on TiN coating thickness, in qualitative agreement with scattering mechanisms of the Boltzmann transport theory in conductors and semiconductors. The good agreement of theoretical interferometric thermoreflectance simulations with in situ measurements during a specific industrial TiN sputter-coating growth process and the independence of the thermoreflectance and thin-coating-thickness reflectance coefficients from temperature show the potential of using this nonintrusive noncontacting technique as an optical thermometer to determine surface temperatures of physically inaccessible samples undergoing industrial coating deposition processes.

  1. ZnO-Based Transparent Thin-Film Transistors with MgO Gate Dielectric Grown by in-situ MOCVD

    NASA Astrophysics Data System (ADS)

    Zhao, Wang; Dong, Xin; Zhao, Long; Shi, Zhi-Feng; Wang, Jin; Wang, Hui; Xia, Xiao-Chuan; Chang, Yu-Chun; Zhang, Bao-Lin; Du, Guo-Tong

    2010-12-01

    ZnO transparent thin-film transistors with MgO gate dielectric were fabricated by in-situ metal organic chemical vapor deposition (MOCVD) technology. We used an uninterrupted growth method to simplify the fabrication steps and to avoid the unexpectable contaminating during epitaxy process. MgO layer is helpful to reduce the gate leakage current, as well as to achieve high transparency in visible light band, due to the wide band gap (7.7eV) and high dielectric constant (9.8). The XRD measurement indicates that the ZnO layer has high crystal quality. The field effect mobility and the on/off current ratio of the device is 2.69 cm2 V-1s-1 and ~ 1 × 104, respectively.

  2. Tuning phase transitions in FeSe thin flakes by field-effect transistor with solid ion conductor as the gate dielectric

    NASA Astrophysics Data System (ADS)

    Lei, B.; Wang, N. Z.; Shang, C.; Meng, F. B.; Ma, L. K.; Luo, X. G.; Wu, T.; Sun, Z.; Wang, Y.; Jiang, Z.; Mao, B. H.; Liu, Z.; Yu, Y. J.; Zhang, Y. B.; Chen, X. H.

    2017-01-01

    We have developed a field-effect transistor (FET) device using a solid ion conductor (SIC) as the gate dielectric, which can tune the carrier density of FeSe by driving lithium ions in and out of the FeSe thin flakes and consequently control the physical properties and phase transitions. A dome-shaped superconducting phase diagram was mapped out with increasing Li content, with Tc˜46.6 K for optimal doping, and an insulating phase was reached at the extremely overdoped regime. Our study suggests that, by using a solid ion conductor as the gate dielectric, the SIC-FET device is able to induce much higher carrier doping in the bulk, suit many surface-sensitive experimental probes, and stabilize structural phases that are inaccessible in ordinary conditions.

  3. Growth, structure and dielectric characteristics of Ba[(Fe1/2Nb1/2)0.1Ti0.9]O3 thin films by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Zhang, Wei; Li, Lei; Ming Chen, Xiang

    2013-01-01

    Ba[(Fe1/2Nb1/2)0.1Ti0.9]O3 thin films were grown on Pt/TiO2/SiO2/Si substrates by pulsed laser deposition at 823 and 923 K. X-ray diffraction analysis suggested the cubic perovskite structure at room temperature. The dielectric properties were investigated at various frequencies (100-106 Hz). Three dielectric abnormalities were observed in the temperature range of 120 to 400 K. The abrupt change in dielectric constant and dielectric loss around 288 K demonstrated the diffused ferroelectric behavior of the thin films. The polarization-electric filed (P-E) loops were measured at different temperatures. Slimmer P-E hysteresis loops were observed with increasing temperature. Raman spectra of Ba[(Fe1/2Nb1/2)0.1Ti0.9]O3 thin films at room temperature indicated local C4v symmetry caused by the displacement of Ti4+ ions. Extra Raman peaks in the thin films compared to that of the bulk ceramic implied extra structure distortion in the thin films. The stress relating to the misfit of the thermal expansion coefficient between the substrate and the thin film might contribute the structure distortion in the thin films.

  4. Polar and Nonpolar Gallium Nitride and Zinc Oxide based thin film heterostructures Integrated with Sapphire and Silicon

    NASA Astrophysics Data System (ADS)

    Gupta, Pranav

    This dissertation work explores the understanding of the relaxation and integration of polar and non-polar of GaN and ZnO thin films with Sapphire and silicon substrates. Strain management and epitaxial analysis has been performed on wurtzitic GaN(0001) thin films grown on c-Sapphire and wurtzitic non-polar a-plane GaN(11-20) thin films grown on r-plane Sapphire (10-12) by remote plasma atomic nitrogen source assisted UHV Pulsed Laser Deposition process. It has been established that high-quality 2-dimensional c-axis GaN(0001) nucleation layers can be grown on c-Sapphire by PLD process at growth temperatures as low as ˜650°C. Whereas the c-axis GaN on c-sapphire has biaxially negative misfit, the crystalline anisotropy of the a-plane GaN films on r-Sapphire results in compressive and tensile misfits in the two major orthogonal directions. The measured strains have been analyzed in detail by X-ray, Raman spectroscopy and TEM. Strain relaxation in GaN(0001)/Sapphire thin film heterostructure has been explained by the principle of domain matched epitaxial growth in large planar misfit system and has been demonstrated by TEM study. An attempt has been made to qualitatively understand the minimization of free energy of the system from the strain perspective. Analysis has been presented to quantify the strain components responsible for the compressive strain observed in the GaN(0001) thin films on c-axis Sapphire substrates. It was also observed that gallium rich deposition conditions in PLD process lead to smoother nucleation layers because of higher ad-atom mobility of gallium. We demonstrate near strain relaxed epitaxial (0001) GaN thin films grown on (111) Si substrates using TiN as intermediate buffer layer by remote nitrogen plasma assisted UHV pulsed laser deposition (PLD). Because of large misfits between the TiN/GaN and TiN/Si systems the TIN buffer layer growth occurs via nucleation of interfacial dislocations under domain matching epitaxy paradigm. X-ray and

  5. A study of the microstructure and optical properties of thin lead-dielectric cermet films. Ph.D. Thesis - Va. Polytechnic Inst. and State Univ.

    NASA Technical Reports Server (NTRS)

    Owen, R. B.

    1972-01-01

    A transmission electron microscopy study involving direct and replicating techniques is directed to a definition of the microstructure of radio frequency-sputtered, thin lead-dielectric cermet films. Once defined, this microstructure is used to obtain theoretical film refractive indices. The Maxwell Garnett theory provides a basis for the theoretical results. Measurements of film transmission and reflectivity are used to obtain rough experimental values for film refractive indices by the Tekucheva method. More exact values are obtained via ellipsometry. The rough Tekucheva values are used to determine the range over which computer calculations interpreting the ellipsometric results must be made. This technique yields accurate values for the film refractive indices.

  6. Measurement of Transient Tool Internal Temperature Fields by Novel Micro Thin Film Sensors Embedded in Polycrystalline Cubic Boron Nitride Cutting Inserts

    NASA Astrophysics Data System (ADS)

    Werschmoeller, Dirk

    Monitoring and control of thermomechanical phenomena in tooling are imperative for advancing fundamental understanding, enhancing reliability, and improving workpiece quality in material removal processes. Polycrystalline cubic boron nitride (PCBN) tools are being used heavily in numerous machining processes, e.g., machining of hardened low carbon steel and superalloys. These processes are very sensitive to variations in local cutting conditions at, or close to, the tool-workpiece interface, but lack a thorough understanding of fundamental transient thermo-mechanical phenomena present. As a result, abrupt catastrophic tool failures and degraded machined surfaces frequently occur. Existing sensors are not suitable for process control and monitoring, as they are either destructively embedded and/or do not possess the necessary spatial and temporal resolution to provide relevant data during machining. This research presents a novel approach for obtaining thermomechanical data from the close vicinity (i.e., 10s of micrometers) of the tool-workpiece interface. Arrays of micro thin film thermocouples with junction size 5 x 5 mum were fabricated by standard microfabrication methods and have been successfully embedded into PCBN using diffusion bonding. Electron microscopy and X-ray spectroscopy were employed to examine material interactions at the bonding interface and to determine optimal bonding parameters. Static and dynamic sensor performances have been characterized. The sensors exhibit excellent linearity up to 1300 °C, fast rise time of 150 ns, and possess good sensitivity. The inserts instrumented with embedded thin film C-type thermocouples were successfully applied to measure internal tool temperatures as close as 70 mum to the cutting edge while machining aluminum and hardened steel workpieces at industrially relevant cutting parameters. Acquired temperature data follow theoretical trends very well. Correlations between temperature and cutting parameters have

  7. Layer-by-layer structured polymer/TiO2 thin film and its gate dielectric application.

    PubMed

    Park, Bong Jun; Park, Jae Hoon; Choi, Jong Sun; Choi, Hyoung Jin

    2010-07-01

    Composite materials of the polymer and inorganic dielectric material have been investigated due to synergistic effect of both flexible properties of the polymer and dielectric properties of the inorganic material. In this study, poly(methyl methacrylate-co-methacrylic acid)/titanium dioxide (PMMA-co-MAA/TiO2) bilayer films were fabricated using a spin coating method followed by a self assembled sol-gel process and then examined for a gate dielectric application of the OTFT. Fracture and surface morphologies of the bilayer film on silicon wafer was observed via both SEM and AFM. Dielectric constant of the composite film synthesized was found to be larger than that of pure polymer film. In addition, with pentacene as a conducting layer, device performance of the composite film was characterized, and it was found that the threshold gate voltage was reduced while the field induced current was increased.

  8. Metal-oxide-semiconductor capacitors on GaAs with germanium nitride passivation layer

    NASA Astrophysics Data System (ADS)

    Zhao, Han; Kim, Hyoung-Sub; Zhu, Feng; Zhang, Manhong; OK, Injo; Park, Sung Il; Yum, Jung Hwan; Lee, Jack C.

    2007-10-01

    We present gallium arsenide (GaAs) metal-oxide-semiconductor capacitors (MOSCAPs) with a thin HfO2 gate dielectric and a thin germanium nitride (GexNy) interfacial passivation layer (IPL). TaN /HfO2/GexNy/GaAs MOSCAPs show a low interface state density and a thin equivalent oxide thickness (1.6nm). Compared to GaAs MOSCAPs with germanium (Ge) IPL, the GexNy IPL has a smaller slow trap density, which is confirmed by improved C-V characteristics without humps near the flatband voltage. The lower rate of flatband voltage shift and gate leakage decreasing under constant gate voltage stress were also demonstrated in GaAs MOSCAPs with GexNy IPL than the Ge IPL.

  9. HfO2 gate dielectric on Ge (1 1 1) with ultrathin nitride interfacial layer formed by rapid thermal NH3 treatment

    NASA Astrophysics Data System (ADS)

    Agrawal, Khushabu S.; Patil, Vilas S.; Khairnar, Anil G.; Mahajan, Ashok M.

    2016-02-01

    Interfacial properties of the ALD deposited HfO2 over the surface nitrided germanium substrate have been studied. The formation of GeON (∼1.7 nm) was confirmed by X-ray photoelectron spectroscopy (XPS) and high resolution transmission electron spectroscopy (HRTEM) over the germanium surface. The effect of post deposition annealing temperature was investigated to study the interfacial and electrical properties of hafnium oxide/germanium oxynitride gate stacks. The high-k MOS devices with ultrathin GeON layer shows the good electrical characteristics including higher k value ∼18, smaller equivalent oxide thickness (EOT) around 1.5 nm and smaller hysteresis value less than 170 mV. The Qeff and Dit values are somewhat greater due to the (1 1 1) orientation of the germanium and may be due to the presence of nitrogen at the interface. The Fowler-Northeim (FN) tunneling of Ge MOS devices has been studied. The barrier height ΦB extracted from the plot is ∼1 eV.

  10. Dielectric Composite Thin Films

    DTIC Science & Technology

    1989-11-01

    more compressive under deposition conditions, such as high temperature, low pressure or energetic ion bombardment, that produce a more densely packed...film porosity and silica content. Thus, films formed at high temperatures and low pressures , as well as under ion bombardment during deposition, have...and their mixtures were deposited on 100-300 *C substrates and under reactive gas III. RESULTS pressures of 1-10x 10- Torr 02. 02 was UHP grade with A

  11. Sputtered (barium(x), strontium(1-x))titanate, BST, thin films on flexible copper foils for use as a non-linear dielectric

    NASA Astrophysics Data System (ADS)

    Laughlin, Brian James

    Ferroelectric thin film dielectrics have a non-linear DC bias dependent permittivity and can be used as the dielectric between metal electrodes to make tunable Metal-Insulator-Metal (MIM) capacitors. Varactors can be used to change the resonance frequency of a circuit allowing high speed frequency switching intra- and inter-band. 2-D geometric arrays of circuitry, where resonant frequency is independently controlled by tunable elements in each section of the array, allow electromagnetic radiation to be focused and the wave front spatial trajectory controlled. BST thin films varactors allow large DC fields to be applied with modest voltages providing large tunabilities. If ferroelectric thin film based devices are to complement or supplant semiconductor varactors as tunable elements then devices must be synthesized using a low cost processing techniques. The Film on Foil process methodology for depositing BST thin films on copper foil substrates was used to create BST/Cu specimens. Sputtering conditions were determined via BST deposition on platinized silicon. Sputtered BST thin films were synthesized on Cu foil substrates and densified using high T, controlled pO2 anneals. XRD showed the absence of Cu2O in as-deposited, post crystallization annealed, and post "re-ox" annealed state. Data showed a polycrystalline BST microstructure with a 55--80 nm grain size and no copper oxidation. HRTEM imaging qualitatively showed evidence of an abrupt BST/Cu interface free from oxide formation. Dielectric properties of Cu/BST/Pt MIM devices were measured as a function of DC bias, frequency, and temperature. A permittivity of 725 was observed with tunability >3:1 while zero bias tan delta of 0.02 saturating to tan delta < 0.003 at high DC bias. No significant frequency dispersion was observed over five decades of frequency. Temperature dependent measurements revealed a broad ferroelectric transition with a maximum at -32°C which sustains a large tunability over -150°C to 150

  12. Dielectric properties of Ca(Zr{sub 0.05}Ti{sub 0.95})O{sub 3} thin films prepared by chemical solution deposition

    SciTech Connect

    Cavalcante, L.S. . E-mail: laeciosc@bol.com.br; Simoes, A.Z.; Santos, M.R.M.C.; Longo, E.

    2006-12-15

    Ca(Zr{sub 0.05}Ti{sub 0.95})O{sub 3} (CZT) thin films were grown on Pt(111)/Ti/SiO{sub 2}/Si(100) substrates by the soft chemical method. The films were deposited from spin-coating technique and annealed at 928K for 4h under oxygen atmosphere. CZT films present orthorhombic structure with a crack free and granular microstructure. Atomic force microscopy and field-emission scanning electron microscopy showed that CZT present grains with about 47nm and thickness about 450nm. Dielectric constant and dielectric loss of the films was approximately 210 at 100kHz and 0.032 at 1MHz. The Au/CZT/Pt capacitor shows a hysteresis loop with remnant polarization of 2.5{mu}C/cm{sup 2}, and coercive field of 18kV/cm, at an applied voltage of 6V. The leakage current density was about 4.6x10{sup -8}A/cm{sup 2} at 3V. Dielectric constant-voltage curve is located at zero bias field suggesting the abseof internal electric fields.

  13. Effectiveness of BaTiO 3 dielectric patches on YBa 2 Cu 3 O 7 thin films for MEM switches

    DOE PAGES

    Vargas, J.; Hijazi, Y.; Noel, J.; ...

    2014-05-12

    A micro-electro-mechanical (MEM) switch built on a superconducting microstrip filter will be utilized to investigate BaTiO3 dielectric patches for functional switching points of contact. Actuation voltage resulting from the MEM switch provokes static friction between the bridge membrane and BaTiO3 insulation layer. Furthermore, the dielectric patch crystal structure and roughness affect the ability of repetitively switching cycles and lifetime. We performed a series of experiments using different deposition methods and RF magnetron sputtering was found to be the best deposition process for the BaTiO3 layer. The effect examination of surface morphology will be presented using characterization techniques as x-ray diffraction,more » SEM and AFM for an optimum switching device. The thin film is made of YBa2Cu3O7 deposited on LaAlO3 substrate by pulsed laser deposition. In our work, the dielectric material sputtering pressure is set at 9.5x10-6 Torr. The argon gas is released through a mass-flow controller to purge the system prior to deposition. RF power is 85 W at a distance of 9 cm. The behavior of Au membranes built on ultimate BaTiO3 patches will be shown as part of the results. These novel surface patterns will in turn be used in modelling other RF MEM switch devices such as distributed-satellite communication system operating at cryogenic temperatures.« less

  14. Improved integration of ultra-thin high-k dielectrics in few-layer MoS2 FET by remote forming gas plasma pretreatment

    NASA Astrophysics Data System (ADS)

    Wang, Xiao; Zhang, Tian-Bao; Yang, Wen; Zhu, Hao; Chen, Lin; Sun, Qing-Qing; Zhang, David Wei

    2017-01-01

    The effective and high-quality integration of high-k dielectrics on two-dimensional (2D) crystals is essential to the device structure engineering and performance improvement of field-effect transistor (FET) based on the 2D semiconductors. We report a 2D MoS2 transistor with ultra-thin Al2O3 top-gate dielectric (6.1 nm) and extremely low leakage current. Remote forming gas plasma pretreatment was carried out prior to the atomic layer deposition, providing nucleation sites with the physically adsorbed ions on the MoS2 surface. The top gate MoS2 FET exhibited excellent electrical performance, including high on/off current ratio over 109, subthreshold swing of 85 mV/decade and field-effect mobility of 45.03 cm2/V s. Top gate leakage current less than 0.08 pA/μm2 at 4 MV/cm has been obtained, which is the smallest compared with the reported top-gated MoS2 transistors. Such an optimized integration of high-k dielectric in 2D semiconductor FET with enhanced performance is very attractive, and it paves the way towards the realization of more advanced 2D nanoelectronic devices and integrated circuits.

  15. Effects of Ta incorporation in La{sub 2}O{sub 3} gate dielectric of InGaZnO thin-film transistor

    SciTech Connect

    Qian, L. X.; Lai, P. T.; Tang, W. M.

    2014-03-24

    The effects of Ta incorporation in La{sub 2}O{sub 3} gate dielectric of amorphous InGaZnO thin-film transistor are investigated. Since the Ta incorporation is found to effectively enhance the moisture resistance of the La{sub 2}O{sub 3} film and thus suppress the formation of La(OH){sub 3}, both the dielectric roughness and trap density at/near the InGaZnO/dielectric interface can be reduced, resulting in a significant improvement in the electrical characteristics of transistor. Among the samples with different Ta contents, the one with a Ta/(Ta + La) atomic ratio of 21.7% exhibits the best performance, including high saturation carrier mobility of 23.4 cm{sup 2}/V·s, small subthreshold swing of 0.177 V/dec, and negligible hysteresis. Nevertheless, excessive incorporation of Ta can degrade the device characteristics due to newly generated Ta-related traps.

  16. Effectiveness of BaTiO3 dielectric patches on YBa2Cu3O7 thin films for MEM switches

    DOE PAGES

    Vargas, J.; Hijazi, Y.; Noel, J.; ...

    2014-05-12

    A micro-electro-mechanical (MEM) switch built on a superconducting microstrip filter will be utilized to investigate BaTiO3 dielectric patches for functional switching points of contact. Actuation voltage resulting from the MEM switch provokes static friction between the bridge membrane and BaTiO3 insulation layer. Furthermore, the dielectric patch crystal structure and roughness affect the ability of repetitively switching cycles and lifetime. We performed a series of experiments using different deposition methods and RF magnetron sputtering was found to be the best deposition process for the BaTiO3 layer. The effect examination of surface morphology will be presented using characterization techniques as x-ray diffraction,more » SEM and AFM for an optimum switching device. The thin film is made of YBa2Cu3O7 deposited on LaAlO3 substrate by pulsed laser deposition. In our work, the dielectric material sputtering pressure is set at 9.5x10-6 Torr. The argon gas is released through a mass-flow controller to purge the system prior to deposition. RF power is 85 W at a distance of 9 cm. The behavior of Au membranes built on ultimate BaTiO3 patches will be shown as part of the results. These novel surface patterns will in turn be used in modelling other RF MEM switch devices such as distributed-satellite communication system operating at cryogenic temperatures.« less

  17. Fabrication and properties of plasmonic crystalline thin film of titanium nitride (TiN) by pulsed laser deposition with Nd:YAG laser at 355 nm

    NASA Astrophysics Data System (ADS)

    Oshikane, Yasushi

    2016-09-01

    For efficient plasmonic MIM structures in fabrication of optical nano-probe tip for scanning near-field microscope (SNOM), an experimental study of thin film fabrication of titanium nitride (TiN) has been started by pulsed laser deposition (PLD) with 3rd harmonic (355nm) pulses of high-power Nd:YAG laser. Inside a TMP-pumped UHV chamber, a TiN powder sintered body has been irradiated with the UV laser pulses (3.3 nsFWHM, 10Hz, up to 340mJ/ pulse on target) at different intensities and incident angles. The deposited films on glass slide or silicon wafer has been analyzed by X-ray diffractometer (XRD), UV-Vis spectrophotometer, scanning electron microscope (SEM), and X-ray photoelectron spectroscopy (XPS). Previously-reported PLD fabrication experiments for TiN film used a titanium (Ti) target with several gas species including nitrogen. The laser-produced Ti plasma with an appropriate condition had a chemical reaction with nitrogen molecules, and the resultant TiN film was deposited on a substrate. While on the other hand, this study has significant features of (1) PLD target made of crystalline powder sintered body and (2) UV laser pulses having temporally-smoothed gaussian profile by injection-seeding of IR laser diode beam. The very first trial depositions have succeeded to fabricate flat and dense films of a few hundred nm, which were partly covered with debris and cracks. The resultant XRD pattern of film having luster of gold indicated several peaks including 42.6° (200) and 61.8° (220) which correspond to crystal structure of TiN. The electron configuration in the PLDed TiN film is studied using XPS.

  18. Thin film growth of boron nitride on {alpha}-Al{sub 2}O{sub 3} (0 0 1) substrates by reactive sputtering

    SciTech Connect

    Anzai, Atsushi; Nishiyama, Fumitaka; Yamanaka, Shoji; Inumaru, Kei

    2011-12-15

    Highlights: Black-Right-Pointing-Pointer A BN film grown on {alpha}-Al{sub 2}O{sub 3} (0 0 1) had a structure in which h-BN sheet stacking continued through almost the whole film thickness. Black-Right-Pointing-Pointer The structure was characterized by X-ray diffraction, ATR-IR, and XPS. Black-Right-Pointing-Pointer Tauc plots suggested the film had direct band gap and the optical band gap was close to that of bulk h-BN. -- Abstract: Boron nitride thin films were grown on {alpha}-Al{sub 2}O{sub 3} (0 0 1) substrates by reactive magnetron sputtering. Infrared attenuated total reflection (ATR) spectra of the films gave an intense signal associated with in-plane B-N stretching TO mode of short range ordered structure of BN hexagonal sheets. X-ray diffraction for the film prepared at a low working pressure (ca. 1 Multiplication-Sign 10{sup -3} Torr) gave a diffraction peak at slightly lower angle than that corresponding to crystal plane h-BN (0 0 2). It is notable that crystal thickness calculated from X-ray peak linewidth (45 nm) was close to film thickness (53 nm), revealing well developed sheet stacking along the direction perpendicular to the substrate surface. When the substrates of MgO (0 0 1) and Si (0 0 1) were used, the short-range ordered structure of h-BN sheet was formed but the films gave no X-ray diffraction. The film showed optical band gap of 5.9 eV, being close to that for bulk crystalline h-BN.

  19. Enhanced current transport and injection in thin-film gallium-nitride light-emitting diodes by laser-based doping.

    PubMed

    Kim, Su Jin; Kim, Kyeong Heon; Chung, Ho Young; Shin, Hee Woong; Lee, Byeong Ryong; Jeong, Tak; Park, Hyung Jo; Kim, Tae Geun

    2014-10-08

    This paper reports improvements in the electrical and optical properties of blue-emission gallium nitride (GaN)-based thin-film light-emitting diodes (TFLEDs) after laser-based Si doping (LBSD) of a nitrogen-face n-GaN (denoted as hereafter n-GaN) layer. Experimental results show that the light-output powers of the flat- and rough-surface TFLEDs after LBSD are 52.1 and 11.35% higher than those before LBSD, respectively, at a current of 350 mA, while the corresponding operating voltages are decreased by 0.22 and 0.28 V for the flat- and rough-surface TFLEDs after LBSD, respectively. The reduced operating voltage after LBSD of the top n-GaN layer may result from the remarkably decreased specific contact resistance at the metal/n-GaN interface and the low series resistance of the TFLED device. The LBSD of n-GaN increases the number of nitrogen vacancies, and Si substitutes for Ga (SiGa) at the metal/n-GaN interface to produce highly Si-doped regions in n-GaN, leading to a decrease in the Schottky barrier height and width. As a result, the specific contact resistances are significantly decreased to 1.56 × 10(-5) and 2.86 × 10(-5) Ω cm(2) for the flat- and rough-surface samples after LBSD, respectively. On the other hand, the increased light-output power after LBSD can be explained by the uniform current spreading, efficient current injection, and enhanced light scattering resulting from the low contact resistivity, low lateral current resistance, and additional textured surface, respectively. Furthermore, LBSD did not degrade the electrical properties of the TFLEDs owing to low reverse leakage currents. The results indicate that our approach could potentially enable high-efficiency and high-power capabilities for optoelectronic devices.

  20. Growth of fullerene-like carbon nitride thin solid films consisting of cross-linked nano-onions

    NASA Astrophysics Data System (ADS)

    Czigány, Zs.; Brunell, I. F.; Neidhardt, J.; Hultman, L.; Suenaga, K.

    2001-10-01

    Fullerene-like CNx (x≈0.12) thin solid films were deposited by reactive magnetron sputtering of graphite in a nitrogen and argon discharge on cleaved NaCl and Si(001) substrates at 450 °C. As-deposited films consist of 5 nm diam CNx nano-onions with shell sizes corresponding to Goldberg polyhedra determined by high-resolution transmission electron microscopy. Electron energy loss spectroscopy revealed that N incorporation is higher in the core of the onions than at the perimeter. N incorporation promotes pentagon formation and provides reactive sites for interlinks between shells of the onions. A model is proposed for the formation of CNx nano-onions by continuous surface nucleation and growth of hemispherical shells.

  1. Charge injection in thin dielectric layers by atomic force microscopy: influence of geometry and material work function of the AFM tip on the injection process

    NASA Astrophysics Data System (ADS)

    Villeneuve-Faure, C.; Makasheva, K.; Boudou, L.; Teyssedre, G.

    2016-06-01

    Charge injection and retention in thin dielectric layers remain critical issues for the reliability of many electronic devices because of their association with a large number of failure mechanisms. To overcome this drawback, a deep understanding of the mechanisms leading to charge injection close to the injection area is needed. Even though the charge injection is extensively studied and reported in the literature to characterize the charge storage capability of dielectric materials, questions about charge injection mechanisms when using atomic force microscopy (AFM) remain open. In this paper, a thorough study of charge injection by using AFM in thin plasma-processed amorphous silicon oxynitride layers with properties close to that of thermal silica layers is presented. The study considers the impact of applied voltage polarity, work function of the AFM tip coating and tip curvature radius. A simple theoretical model was developed and used to analyze the obtained experimental results. The electric field distribution is computed as a function of tip geometry. The obtained experimental results highlight that after injection in the dielectric layer the charge lateral spreading is mainly controlled by the radial electric field component independently of the carrier polarity. The injected charge density is influenced by the nature of electrode metal coating (work function) and its geometry (tip curvature radius). The electron injection is mainly ruled by the Schottky injection barrier through the field electron emission mechanism enhanced by thermionic electron emission. The hole injection mechanism seems to differ from the electron one depending on the work function of the metal coating. Based on the performed analysis, it is suggested that for hole injection by AFM, pinning of the metal Fermi level with the metal-induced gap states in the studied silicon oxynitride layers starts playing a role in the injection mechanisms.

  2. Through nanohole formation in thin metallic film by single nanosecond laser pulses using optical dielectric apertureless probe.

    PubMed

    Kulchin, Y N; Vitrik, O B; Kuchmizhak, A A; Nepomnyashchii, A V; Savchuk, A G; Ionin, A A; Kudryashov, S I; Makarov, S V

    2013-05-01

    Separate nanoholes with the minimum size down to 35 nm (~λ/15) and nanohole arrays with the hole size about 100 nm (~λ/5) were fabricated in a 50 nm optically "thick" Au/Pd film, using single 532 nm pump nanosecond laser pulses focused to diffraction-limited spots by a specially designed apertureless dielectric fiber probe. Nanohole fabrication in the metallic film was found to result from lateral heat diffusion and center-symmetrical lateral expulsion of the melt by its vapor recoil pressure. The optimized apertureless dielectric microprobe was demonstrated to enable laser fabrication of deep through nanoholes.

  3. Study of selective amorphous silicon etching to silicon nitride using a pin-to-plate dielectric barrier discharge in atmospheric pressure

    NASA Astrophysics Data System (ADS)

    Kyung, Se-Jin; Park, Jae-Beom; Lee, June-Hee; Lim, Jong-Tae; Yeom, Geun-Young

    2007-08-01

    Remote-type atmospheric pressure plasmas were generated using a modified dielectric barrier discharge with the powered electrode consisting of multipins instead of a conventional blank planar plate. For the N2/NF3 gas mixture, a high etch rate of a :Si close to 115nm/s was obtained by adding 300SCCM (SCCM denotes cubic centimeter per minute at STP) of NF3 to N2 [50SLM (standard liters per minute)] at an ac rms voltage of 8.5kV (2.5kW, 30kHz). However, the selectivity of a :Si to Si3N4 was as low as 1.3. A selectivity of a :Si/Si3N4>5.0 could be obtained while maintaining an etch rate of a :Si at 110nm/s by adding 250SCCM CF4 to the N2 (50SLM )/NF3 (300SCCM) mixture through the formation of a C-F polymer layer preferentially on the Si3N4 surface.

  4. Novel chemical route to prepare a new polymer blend gate dielectric for flexible low-voltage organic thin-film transistor.

    PubMed

    Meena, Jagan Singh; Chu, Min-Ching; Chang, Yu-Cheng; Wu, Chung-Shu; Cheng, Chih-Chia; Chang, Feng-Chih; Ko, Fu-Hsiang

    2012-06-27

    An organic-organic blend thin film has been synthesized through the solution deposition of a triblock copolymer (Pluronic P123, EO20-PO70-EO20) and polystyrene (PS), which is called P123-PS for the blend film whose precursor solution was obtained with organic additives. In addition to having excellent insulating properties, these materials have satisfied other stringent requirements for an optimal flexible device: low-temperature fabrication, nontoxic, surface free of pinhole defect, compatibility with organic semiconductors, and mechanical flexibility. Atomic force microscope measurements revealed that the optimized P123-PS blend film was uniform, crack-free, and highly resistant to moisture absorption on polyimide (PI) substrate. The film was well-adhered to the flexible Au/Cr/PI substrate for device application as a stable insulator, which was likely due to the strong molecular assembly that includes both hydrophilic and hydrophobic effects from the high molecular weights. The contact angle measurements for the P123-PS surface indicated that the system had a good hydrophobic surface with a total surface free energy of approximately 19.6 mJ m(-2). The dielectric properties of P123-PS were characterized in a cross-linked metal-insulator-metal structured device on the PI substrate by leakage current, capacitance, and dielectric constant measurements. The P123-PS film showed an average low leakage current density value of approximately 10(-10) A cm(-2) at 5-10 MV cm(-1) and large capacitance of 88.2 nF cm(-2) at 1 MHz, and the calculated dielectric constant was 2.7. In addition, we demonstrated an organic thin-film transistor (OTFT) device on a flexible PI substrate using the P123-PS as the gate dielectric layer and pentacene as the channel layer. The OTFT showed good saturation mobility (0.16 cm(2) V(-1) s(-1)) and an on-to-off current ratio of 5 × 10(5). The OTFT should operate under bending conditions; therefore flexibility tests for two types of bending modes

  5. Low pressure growth of cubic boron nitride films

    NASA Technical Reports Server (NTRS)

    Ong, Tiong P. (Inventor); Shing, Yuh-Han (Inventor)

    1997-01-01

    A method for forming thin films of cubic boron nitride on substrates at low pressures and temperatures. A substrate is first coated with polycrystalline diamond to provide a uniform surface upon which cubic boron nitride can be deposited by chemical vapor deposition. The cubic boron nitride film is useful as a substitute for diamond coatings for a variety of applications in which diamond is not suitable. any tetragonal or hexagonal boron nitride. The cubic boron nitride produced in accordance with the preceding example is particularly well-suited for use as a coating for ultra hard tool bits and abrasives, especially those intended to use in cutting or otherwise fabricating iron.

  6. Dielectric nanosheets made by liquid-phase exfoliation in water and their use in graphene-based electronics

    NASA Astrophysics Data System (ADS)

    Yang, Huafeng; Withers, Freddie; Gebremedhn, Elias; Lewis, Edward; Britnell, Liam; Felten, Alexandre; Palermo, Vincenzo; Haigh, Sarah; Beljonne, David; Casiraghi, Cinzia

    2014-06-01

    One of the challenges associated with the development of next-generation electronics is to find alternatives to silicon oxide caused by the size-reduction constraints of the devices. The dielectric properties of two-dimensional (2D) crystals, added to their excellent chemical stability, mechanical and thermal properties, make them promising dielectrics. Here we show that liquid-phase exfoliation (LPE) in water by using low-cost commercial organic dyes as dispersant agents can efficiently produce defect-free 2D nanosheets, including mono-layers, in suspensions. We further show that these suspensions can be easily incorporated into current practical graphene-based devices. In particular, it is found that boron nitride thin films made by LPE are excellent dielectrics that are highly compatible with graphene-based electronics.

  7. Thermal conductivities of thin, sputtered optical films

    SciTech Connect

    Henager, C.H. Jr.; Pawlewicz, W.T.

    1991-05-01

    The normal component of the thin film thermal conductivity has been measured for the first time for several advanced sputtered optical materials. Included are data for single layers of boron nitride (BN), aluminum nitride (AIN), silicon aluminum nitride (Si-Al-N), silicon aluminum oxynitride (Si-Al-O-N), silicon carbide (SiC), and for dielectric-enhanced metal reflectors of the form Al(SiO{sub 2}/Si{sub 3}N{sub 4}){sup n} and Al(Al{sub 2}O{sub 3}/AIN){sup n}. Sputtered films of more conventional materials like SiO{sub 2}, Al{sub 2}O{sub 3}, Ta{sub 2}O{sub 5}, Ti, and Si have also been measured. The data show that thin film thermal conductivities are typically 10 to 100 times lower than conductivities for the same materials in bulk form. Structural disorder in the amorphous or very fine-grained films appears to account for most of the conductivity difference. Conclusive evidence for a film/substrate interface contribution is presented.

  8. Effect of crystal orientation on the phase diagrams, dielectric and piezoelectric properties of epitaxial BaTiO{sub 3} thin films

    SciTech Connect

    Wu, Huaping E-mail: hpwu@zjut.edu.cn; Ma, Xuefu; Zhang, Zheng; Zeng, Jun; Chai, Guozhong; Wang, Jie

    2016-01-15

    The influence of crystal orientations on the phase diagrams, dielectric and piezoelectric properties of epitaxial BaTiO{sub 3} thin films has been investigated using an expanded nonlinear thermodynamic theory. The calculations reveal that crystal orientation has significant influence on the phase stability and phase transitions in the misfit strain-temperature phase diagrams. In particular, the (110) orientation leads to a lower symmetry and more complicated phase transition than the (111) orientation in BaTiO{sub 3} films. The increase of compressive strain will dramatically enhance the Curie temperature T{sub C} of (110)-oriented BaTiO{sub 3} films, which matches well with previous experimental data. The polarization components experience a great change across the boundaries of different phases at room temperature in both (110)- and (111)-oriented films, which leads to the huge dielectric and piezoelectric responses. A good agreement is found between the present thermodynamics calculation and previous first-principles calculations. Our work provides an insight into how to use crystal orientation, epitaxial strain and temperature to tune the structure and properties of ferroelectrics.

  9. Blending effect of 6,13-bis(triisopropylsilylethynyl) pentacene-graphene composite layers for flexible thin film transistors with a polymer gate dielectric.

    PubMed

    Basu, Sarbani; Adriyanto, Feri; Wang, Yeong-Her

    2014-02-28

    Solution processible poly(4-vinylphenol) is employed as a transistor dielectric material for low cost processing on flexible substrates at low temperatures. A 6,13-bis (triisopropylsilylethynyl) (TIPS) pentacene-graphene hybrid semiconductor is drop cast to fabricate bottom-gate and bottom-contact field-effect transistor devices on flexible and glass substrates under an ambient air environment. A few layers of graphene flakes increase the area in the conduction channel, and form bridge connections between the crystalline regions of the semiconductor layer which can change the surface morphology of TIPS pentacene films. The TIPS pentacene-graphene hybrid semiconductor-based organic thin film transistors (OTFTs) cross-linked with a poly(4-vinylphenol) gate dielectric exhibit an effective field-effect mobility of 0.076 cm(2) V(-1) s(-1) and a threshold voltage of -0.7 V at V(gs) = -40 V. By contrast, typical TIPS pentacene shows four times lower mobility of 0.019 cm(2) V(-1) s(-1) and a threshold voltage of 5 V. The graphene/TIPS pentacene hybrids presented in this paper can enhance the electrical characteristics of OTFTs due to their high crystallinity, uniform large-grain distribution, and effective reduction of crystal misorientation of the organic semiconductor layer, as confirmed by x-ray diffraction spectroscopy, atomic force microscopy, and optical microscopy studies.

  10. Interface Engineering for the Enhancement of Carrier Transport in Black Phosphorus Transistor with Ultra-Thin High-k Gate Dielectric

    PubMed Central

    Ling, Zhi-Peng; Zhu, Jun-Tao; Liu, Xinke; Ang, Kah-Wee

    2016-01-01

    Black phosphorus (BP) is the most stable allotrope of phosphorus which exhibits strong in-plane anisotropic charge transport. Discovering its interface properties between BP and high-k gate dielectric is fundamentally important for enhancing the carrier mobility and electrostatics control. Here, we investigate the impact of interface engineering on the transport properties of BP transistors with an ultra-thin hafnium-dioxide (HfO2) gate dielectric of ~3.4 nm. A high hole mobility of ~536 cm2V−1s−1 coupled with a near ideal subthreshold swing (SS) of ~66 mV/dec were simultaneously achieved at room temperature by improving the BP/HfO2 interface quality through thermal treatment. This is attributed to the passivation of phosphorus dangling bonds by hafnium (Hf) adatoms which produces a more chemically stable interface, as evidenced by the significant reduction in interface states density. Additionally, we found that an excessively high thermal treatment temperature (beyond 200 °C) could detrimentally modify the BP crystal structure, which results in channel resistance and mobility degradation due to charge-impurities scattering and lattice displacement. This study contributes to an insight for the development of high performance BP-based transistors through interface engineering. PMID:27222074

  11. Enhanced resistive switching characteristics in Pt/BaTiO3/ITO structures through insertion of HfO2:Al2O3 (HAO) dielectric thin layer

    PubMed Central

    Silva, J. P. B.; Faita, F. L.; Kamakshi, K.; Sekhar, K. C.; Moreira, J. Agostinho; Almeida, A.; Pereira, M.; Pasa, A. A.; Gomes, M. J. M.

    2017-01-01

    An enhanced resistive switching (RS) effect is observed in Pt/BaTiO3(BTO)/ITO ferroelectric structures when a thin HfO2:Al2O3 (HAO) dielectric layer is inserted between Pt and BTO. The P-E hysteresis loops reveal the ferroelectric nature of both Pt/BTO/ITO and Pt/HAO/BTO/ITO structures. The relation between the RS and the polarization reversal is investigated at various temperatures in the Pt/HAO/BTO/ITO structure. It is found that the polarization reversal induces a barrier variation in the Pt/HAO/BTO interface and causes enhanced RS, which is suppressed at Curie temperature (Tc = 140 °C). Furthermore, the Pt/HAO/BTO/ITO structures show promising endurance characteristics, with a RS ratio >103 after 109 switching cycles, that make them potential candidates for resistive switching memory devices. By combining ferroelectric and dielectric layers this work provides an efficient way for developing highly efficient ferroelectric-based RS memory devices.

  12. Interface Engineering for the Enhancement of Carrier Transport in Black Phosphorus Transistor with Ultra-Thin High-k Gate Dielectric.

    PubMed

    Ling, Zhi-Peng; Zhu, Jun-Tao; Liu, Xinke; Ang, Kah-Wee

    2016-05-25

    Black phosphorus (BP) is the most stable allotrope of phosphorus which exhibits strong in-plane anisotropic charge transport. Discovering its interface properties between BP and high-k gate dielectric is fundamentally important for enhancing the carrier mobility and electrostatics control. Here, we investigate the impact of interface engineering on the transport properties of BP transistors with an ultra-thin hafnium-dioxide (HfO2) gate dielectric of ~3.4 nm. A high hole mobility of ~536 cm(2)V(-1)s(-1) coupled with a near ideal subthreshold swing (SS) of ~66 mV/dec were simultaneously achieved at room temperature by improving the BP/HfO2 interface quality through thermal treatment. This is attributed to the passivation of phosphorus dangling bonds by hafnium (Hf) adatoms which produces a more chemically stable interface, as evidenced by the significant reduction in interface states density. Additionally, we found that an excessively high thermal treatment temperature (beyond 200 °C) could detrimentally modify the BP crystal structure, which results in channel resistance and mobility degradation due to charge-impurities scattering and lattice displacement. This study contributes to an insight for the development of high performance BP-based transistors through interface engineering.

  13. Structural and dielectric properties of Ba{sub 0.7}Sr{sub 0.3}TiO{sub 3} thin films grown by PLD

    SciTech Connect

    James, K. K.; Satish, B.; Jayaraj, M. K.

    2014-01-28

    Ferroelectric thin films of Ba{sub 0.7}Sr{sub 0.3}TiO{sub 3} (BST) were deposited on Si/SiO{sub 2}/TiO{sub 2}/Pt (PtSi) substrate by pulsed laser deposition (PLD). Crystalline films with perovskite structure were obtained without post-deposition annealing. Phase purity of the deposited films was confirmed by x-ray diffraction. The lowest value of FWHM obtained for the film deposited at oxygen pressure 5.4×10{sup −4} mbar and substrate temperature 600°C, indicates the high crystallinity of the film. The room temperature dielectric constant at 100 kHz was 85. Butterfly loop, which is the characteristic of ferroelectric materials, was obtained in the regime of −4 to +4V. The leakage current density was nearly 9×10{sup −13} Acm{sup −2}.

  14. Temperature dependent dielectric function in the near-infrared to vacuum-ultraviolet ultraviolet spectral range of alumina and yttria stabilized zirconia thin films

    SciTech Connect

    Schmidt-Grund, R. Lühmann, T.; Böntgen, T.; Franke, H.; Lorenz, M.; Grundmann, M.; Opper, D.

    2013-12-14

    The dielectric function of nano-/polycrystalline alumina and yttria stabilised zirconia thin films has been investigated in a wide spectral range from 1.0 eV to 7.5 eV and temperatures between 10 K and room temperature. In the near band-edge spectral range, we found a broad distribution of optical transitions within the band gap, the so-called Urbach absorption tail which is typical for amorphous or polycrystalline materials due to the lack of long range order in the crystal structure. The coupling properties of the electronic system to the optical phonon bath and thermal lattice vibrations strongly depend on the ratio of the spectral extent of these disorder states to the main phonon energy, which we correlate with the different crystalline structure of our samples. The films have been grown at room temperature and 650 °C by pulsed laser deposition.

  15. Influence of source and drain contacts on the properties of the indium-zinc oxide thin-film transistors based on anodic aluminum oxide gate dielectrics

    NASA Astrophysics Data System (ADS)

    Lan, Linfeng; Xu, Miao; Peng, Junbiao; Xu, Hua; Li, Min; Luo, Dongxiang; Zou, Jianhua; Tao, Hong; Wang, Lei; Yao, Rihui

    2011-11-01

    Thin-film transistors (TFTs) based on indium-zinc oxide (IZO) active layer and anodic aluminum oxide (Al2O3) gate dielectric layer were fabricated. The influence of source and drain (S/D) contacts on TFT performance was investigated by comparing IZO-TFTs with different S/D electrodes. The TFT with Mo S/D electrodes had higher output current and lower threshold voltage, but had poorer subthreshold swing and lower effective electron mobility compared to that with ITO S/D electrodes. By using x-ray photoelectron spectroscopy (XPS) depth profile analyzing method, it was observed that Mo was diffusing seriously into IZO, resulting in the variation of the effective channel length, thereby causing serious short-channel effect, poor subshreshold swing, and bad uniformity of the TFTs with Mo S/D electrodes.

  16. Alumina nanoparticle/polymer nanocomposite dielectric for flexible amorphous indium-gallium-zinc oxide thin film transistors on plastic substrate with superior stability

    SciTech Connect

    Lai, Hsin-Cheng; Pei, Zingway; Jian, Jyun-Ruri; Tzeng, Bo-Jie

    2014-07-21

    In this study, the Al{sub 2}O{sub 3} nanoparticles were incorporated into polymer as a nono-composite dielectric for used in a flexible amorphous Indium-Gallium-Zinc Oxide (a-IGZO) thin-film transistor (TFT) on a polyethylene naphthalate substrate by solution process. The process temperature was well below 100 °C. The a-IGZO TFT exhibit a mobility of 5.13 cm{sup 2}/V s on the flexible substrate. After bending at a radius of 4 mm (strain = 1.56%) for more than 100 times, the performance of this a-IGZO TFT was nearly unchanged. In addition, the electrical characteristics are less altered after positive gate bias stress at 10 V for 1500 s. Thus, this technology is suitable for use in flexible displays.

  17. Alumina nanoparticle/polymer nanocomposite dielectric for flexible amorphous indium-gallium-zinc oxide thin film transistors on plastic substrate with superior stability

    NASA Astrophysics Data System (ADS)

    Lai, Hsin-Cheng; Pei, Zingway; Jian, Jyun-Ruri; Tzeng, Bo-Jie

    2014-07-01

    In this study, the Al2O3 nanoparticles were incorporated into polymer as a nono-composite dielectric for used in a flexible amorphous Indium-Gallium-Zinc Oxide (a-IGZO) thin-film transistor (TFT) on a polyethylene naphthalate substrate by solution process. The process temperature was well below 100 °C. The a-IGZO TFT exhibit a mobility of 5.13 cm2/V s on the flexible substrate. After bending at a radius of 4 mm (strain = 1.56%) for more than 100 times, the performance of this a-IGZO TFT was nearly unchanged. In addition, the electrical characteristics are less altered after positive gate bias stress at 10 V for 1500 s. Thus, this technology is suitable for use in flexible displays.

  18. Microstructural and dielectric properties of Ba0.6Sr0.4Ti1-xZrxO3 based combinatorial thin film capacitors library

    NASA Astrophysics Data System (ADS)

    Liu, Guozhen; Wolfman, Jérôme; Autret-Lambert, Cécile; Sakai, Joe; Roger, Sylvain; Gervais, Monique; Gervais, François

    2010-12-01

    Epitaxial growth of Ba0.6Sr0.4Ti1-xZrxO3 (0≤x≤0.3) composition spread thin film library on SrRuO3/SrTiO3 layer by combinatorial pulsed laser deposition (PLD) is reported. X-ray diffraction and energy dispersive x-ray spectroscopy studies showed an accurate control of the film phase and composition by combinatorial PLD. A complex evolution of the microstructure and morphology with composition of the library is described, resulting from the interplay between epitaxial stress, increased chemical pressure, and reduced elastic energy upon Zr doping. Statistical and temperature-related capacitive measurements across the library showed unexpected variations in the dielectric properties. Doping windows with enhanced permittivity and tunability are identified, and correlated to microstructural properties.

  19. Series resistance effect on time zero dielectrics breakdown characteristics of MOSCAP with ultra-thin EOT high-k/metal gate stacks

    NASA Astrophysics Data System (ADS)

    Hao, Xu; Hong, Yang; Yanrong, Wang; Wenwu, Wang; Guangxing, Wan; Shangqing, Ren; Weichun, Luo; Luwei, Qi; Chao, Zhao; Dapeng, Chen; Xinyu, Liu; Tianchun, Ye

    2016-05-01

    The time zero dielectric breakdown characteristics of MOSCAP with ultra-thin EOT high-k metal gate stacks are studied. The TZDB results show an abnormal area dependence due to the series resistance effect. The series resistance components extracted from the Fowler-Nordheim tunneling relation are attributed to the spreading resistance due to the asymmetry electrodes. Based on a series model to eliminate the series resistance effect, an area acceleration dependence is obtained by correcting the TZDB results. The area dependence follows Poisson area scaling rules, which indicates that the mechanism of TZDB is the same as TDDB and could be considered as a trap generation process. Project supported by the National High Technology Research and Development Program (863 Program) of China (No. SS2015AA010601), the National Natural Science Foundation of China (Nos. 61176091, 61306129), and the Opening Project of the Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences.

  20. Low temperature silicon nitride by hot wire chemical vapour deposition for the use in impermeable thin film encapsulation on flexible substrates.

    PubMed

    Spee, D A; van der Werf, C H M; Rath, J K; Schropp, R E I

    2011-09-01

    High quality non porous silicon nitride layers were deposited by hot wire chemical vapour deposition at substrate temperatures lower than 110 degrees C. The layer properties were investigated using FTIR, reflection/transmission measurements and 1:6 buffered HF etching rate. A Si-H peak position of 2180 cm(-1) in the Fourier transform infrared absorption spectrum indicates a N/Si ratio around 1.2. Together with a refractive index of 1.97 at a wavelength of 632 nm and an extinction coefficient of 0.002 at 400 nm, this suggests that a transparent high density silicon nitride material has been made below 110 degrees C, which is compatible with polymer films and is expected to have a high impermeability. To confirm the compatibility with polymer films a silicon nitride layer was deposited on poly(glycidyl methacrylate) made by initiated chemical vapour deposition, resulting in a highly transparent double layer.

  1. Method of forming a dielectric thin film having low loss composition of Ba.sub.x Sr.sub.y Ca.sub.1-x-y TiO.sub.3 : Ba.sub.0.12-0.25 Sr.sub.0.35-0.47 Ca.sub.0.32-0.53 TiO.sub.3

    DOEpatents

    Xiang, Xiao-Dong; Chang, Hauyee; Takeuchi, Ichiro

    2000-01-01

    A dielectric thin-film material for microwave applications, including use as a capacitor, the thin-film comprising a composition of barium strontium calcium and titanium of perovskite type (Ba.sub.x Sr.sub.y Ca.sub.1-x-y)TiO.sub.3. Also provided is a method for making a dielectric thin film of that formula over a wide compositional range through a single deposition process.

  2. Integration of bulk-quality thin film magneto-optical cerium-doped yttrium iron garnet on silicon nitride photonic substrates.

    PubMed

    Onbasli, Mehmet C; Goto, Taichi; Sun, Xueyin; Huynh, Nathalie; Ross, C A

    2014-10-20

    Cerium substituted yttrium iron garnet (Ce:YIG) films were grown on yttrium iron garnet (YIG) seed layers on silicon nitride films using pulsed laser deposition. Optimal process conditions for forming garnet films on silicon nitride are presented. Bulk or near-bulk magnetic and magneto-optical properties were observed for 160 nm thick Ce:YIG films grown at 640 °C on rapid thermal annealed 40 nm thick YIG grown at 640 °C and 2 Hz pulse rate. The effect of growth temperature and deposition rate on structural, magnetic and magneto-optical properties has been investigated.

  3. A system for measuring complex dielectric properties of thin films at submillimeter wavelengths using an open hemispherical cavity and a vector network analyzer

    NASA Astrophysics Data System (ADS)

    Rahman, Rezwanur; Taylor, P. C.; Scales, John A.

    2013-08-01

    Quasi-optical (QO) methods of dielectric spectroscopy are well established in the millimeter and submillimeter frequency bands. These methods exploit standing wave structure in the sample produced by a transmitted Gaussian beam to achieve accurate, low-noise measurement of the complex permittivity of the sample [e.g., J. A. Scales and M. Batzle, Appl. Phys. Lett. 88, 062906 (2006);, 10.1063/1.2172403 R. N. Clarke and C. B. Rosenberg, J. Phys. E 15, 9 (1982);, 10.1088/0022-3735/15/1/002 T. M. Hirovnen, P. Vainikainen, A. Lozowski, and A. V. Raisanen, IEEE Trans. Instrum. Meas. 45, 780 (1996)], 10.1109/19.516996. In effect the sample itself becomes a low-Q cavity. On the other hand, for optically thin samples (films of thickness much less than a wavelength) or extremely low loss samples (loss tangents below 10-5) the QO approach tends to break down due to loss of signal. In such a case it is useful to put the sample in a high-Q cavity and measure the perturbation of the cavity modes. Provided that the average mode frequency divided by the shift in mode frequency is less than the Q (quality factor) of the mode, then the perturbation should be resolvable. Cavity perturbation techniques are not new, but there are technological difficulties in working in the millimeter/submillimeter wave region. In this paper we will show applications of cavity perturbation to the dielectric characterization of semi-conductor thin films of the type used in the manufacture of photovoltaics in the 100 and 350 GHz range. We measured the complex optical constants of hot-wire chemical deposition grown 1-μm thick amorphous silicon (a-Si:H) film on borosilicate glass substrate. The real part of the refractive index and dielectric constant of the glass-substrate varies from frequency-independent to linearly frequency-dependent. We also see power-law behavior of the frequency-dependent optical conductivity from 316 GHz (9.48 cm-1) down to 104 GHz (3.12 cm-1).

  4. A system for measuring complex dielectric properties of thin films at submillimeter wavelengths using an open hemispherical cavity and a vector network analyzer.

    PubMed

    Rahman, Rezwanur; Taylor, P C; Scales, John A

    2013-08-01

    Quasi-optical (QO) methods of dielectric spectroscopy are well established in the millimeter and submillimeter frequency bands. These methods exploit standing wave structure in the sample produced by a transmitted Gaussian beam to achieve accurate, low-noise measurement of the complex permittivity of the sample [e.g., J. A. Scales and M. Batzle, Appl. Phys. Lett. 88, 062906 (2006); R. N. Clarke and C. B. Rosenberg, J. Phys. E 15, 9 (1982); T. M. Hirovnen, P. Vainikainen, A. Lozowski, and A. V. Raisanen, IEEE Trans. Instrum. Meas. 45, 780 (1996)]. In effect the sample itself becomes a low-Q cavity. On the other hand, for optically thin samples (films of thickness much less than a wavelength) or extremely low loss samples (loss tangents below 10(-5)) the QO approach tends to break down due to loss of signal. In such a case it is useful to put the sample in a high-Q cavity and measure the perturbation of the cavity modes. Provided that the average mode frequency divided by the shift in mode frequency is less than the Q (quality factor) of the mode, then the perturbation should be resolvable. Cavity perturbation techniques are not new, but there are technological difficulties in working in the millimeter/submillimeter wave region. In this paper we will show applications of cavity perturbation to the dielectric characterization of semi-conductor thin films of the type used in the manufacture of photovoltaics in the 100 and 350 GHz range. We measured the complex optical constants of hot-wire chemical deposition grown 1-μm thick amorphous silicon (a-Si:H) film on borosilicate glass substrate. The real part of the refractive index and dielectric constant of the glass-substrate varies from frequency-independent to linearly frequency-dependent. We also see power-law behavior of the frequency-dependent optical conductivity from 316 GHz (9.48 cm(-1)) down to 104 GHz (3.12 cm(-1)).

  5. Environmentally stable flexible metal-insulator-metal capacitors using zirconium-silicate and hafnium-silicate thin film composite materials as gate dielectrics.

    PubMed

    Meena, Jagan Singh; Chu, Min-Ching; Wu, Chung-Shu; Ravipati, Srikanth; Ko, Fu-Hsiang

    2011-08-01

    Fully flexible metal-insulator-metal (MIM) capacitors fabricated on 25 microm thin polyimide (PI) substrates via the surface sol-gel process using 10-nm-thick zirconium-silicate (ZrSixOy) and hafnium-silicate (HfSimOn) films as gate dielectrics. The surface morphology of the ZrSixOy and HfSimOn films were investigated using atomic force microscopy and scanning electron microscopy, which confirmed that continuous and crack-free surface growth had occurred on the PI. Both the films treated with oxygen (O2) plasma and annealing (ca. 250 degrees C) consisted of amorphous phase; confirmed by X-ray diffraction. We employed X-ray photoelectron spectroscopy (XPS) at high resolution to examine the chemical composition of the films subjected to various treatment conditions. The shift of the XPS peaks towards higher binding energy revealed the O2 plasma-pretreatment followed by annealing was the most effective process to the surface oxidation at relatively low-temperature, for further passivate the grease traps and making dielectric films thermally stable. The ZrSixOy and HfSimOn films in sandwich-like MIM configuration on the PI substrates exhibited the low leakage current densities of 7.1 x 10(-9) and 8.4 x 10(-9) A/cm2 at applied electric field of 10 MV/cm and maximum capacitance densities of 7.5 and 5.3 fF/microm2 at 1 MHz, respectively. In addition, the ZrSixOy and HfSimOn films in MIM capacitors showed the estimated dielectric constants of 8.2 and 6.0, respectively. Prior to use of flexible MIM capacitors in advanced flexible electronic devices; the reliability test was studied by applying day-dependent leakage current density measurements up to 30 days. These films of silicate-surfactant mesostructured materials have special interest to be used as gate dielectrics in future for flexible metal-oxide-semiconductor devices.

  6. Structure and dielectric tunability of (Pb 0.5Ba 0.5)ZrO 3 thin films derived on (Sr 0.95La 0.05)TiO 3 buffer-layered substrates

    NASA Astrophysics Data System (ADS)

    Hao, Xihong; Zhai, Jiwei; Zhou, Jing; Yang, Jichun; Song, Xiwen; An, Shengli

    2010-02-01

    In present work, (Pb 0.5Ba 0.5)ZrO 3 (PBZ) thin films with a thickness of 840 nm were successfully fabricated on (Sr 0.95La 0.05)TiO 3 (SLT) buffer-layered Pt(1 1 1)/TiO 2/SiO 2/Si(1 0 0) substrates via the sol-gel technique. The effects of SLT buffer layer on the microstructure and electrical properties of PBZ thin films were investigated systemically. X-ray diffraction (XRD) and scanning electron microscopy (SEM) results indicated that PBZ thin films on SLT buffer-layered substrates showed a more uniform structure with a random orientation. Dielectric measurements illustrated that PBZ films with SLT buffer layer displayed larger dielectric constant, improved tunability and enhanced figure of merit (FOM). Moreover, leakage current of PBZ films was also reduced by SLT buffer layer.

  7. Structural and dielectric behavior of pulsed laser ablated Sr 0.6Ca 0.4TiO 3 thin film and asymmetric multilayer of SrTiO 3 and CaTiO 3

    NASA Astrophysics Data System (ADS)

    Chakraborty, Pradip; Choudhury, Palash Roy; Krupanidhi, S. B.

    2011-12-01

    Homogeneous thin films of Sr 0.6Ca 0.4TiO 3 (SCT40) and asymmetric multilayer of SrTiO 3 (STO) and CaTiO 3 (CTO) were fabricated on Pt/Ti/SiO 2/Si substrates by using pulsed laser deposition technique. The electrical behavior of films was observed within a temperature range of 153 K-373 K. A feeble dielectric peak of SCT40 thin film at 273 K is justified as paraelectric to antiferroelectric phase transition. Moreover, the Curie-Weiss temperature, determined from the ɛ'( T) data above the transition temperature is found to be negative. Using Landau theory, the negative Curie-Weiss temperature is interpreted in terms of an antiferroelectric transition. The asymmetric multilayer exhibits a broad dielectric peak at 273 K, and is attributed to interdiffusion at several interfaces of multilayer. The average dielectric constants for homogeneous Sr 0.6Ca 0.4TiO 3 films (˜650) and asymmetric multilayered films (˜350) at room temperature are recognized as a consequence of grain size effect. Small frequency dispersion in the real part of the dielectric constants and relatively low dielectric losses for both cases ensure high quality of the films applicable for next generation integrated devices.

  8. A complementary organic inverter of porphyrazine thin films: low-voltage operation using ionic liquid gate dielectrics.

    PubMed

    Fujimoto, Takuya; Miyoshi, Yasuhito; Matsushita, Michio M; Awaga, Kunio

    2011-05-28

    We studied a complementary organic inverter consisting of a p-type semiconductor, metal-free phthalocyanine (H(2)Pc), and an n-type semiconductor, tetrakis(thiadiazole)porphyrazine (H(2)TTDPz), operated through the ionic-liquid gate dielectrics of N,N-diethyl-N-methyl(2-methoxyethyl)ammonium bis(trifluoromethylsulfonyl)imide (DEME-TFSI). This organic inverter exhibits high performance with a very low operation voltage below 1.0 V and a dynamic response up to 20 Hz.

  9. Spin transport in fully hexagonal boron nitride encapsulated graphene

    NASA Astrophysics Data System (ADS)

    Gurram, M.; Omar, S.; Zihlmann, S.; Makk, P.; Schönenberger, C.; van Wees, B. J.

    2016-03-01

    We study fully hexagonal boron nitride (hBN) encapsulated graphene spin valve devices at room temperature. The device consists of a graphene channel encapsulated between two crystalline hBN flakes: thick-hBN flake as a bottom gate dielectric substrate which masks the charge impurities from SiO2/Si substrate and single-layer thin-hBN flake as a tunnel barrier. Full encapsulation prevents the graphene from coming in contact with any polymer/chemical during the lithography and thus gives homogeneous charge and spin transport properties across different regions of the encapsulated graphene. Further, even with the multiple electrodes in-between the injection and the detection electrodes which are in conductivity mismatch regime, we observe spin transport over 12.5 -μ m -long distance under the thin-hBN encapsulated graphene channel, demonstrating the clean interface and the pinhole-free nature of the thin hBN as an efficient tunnel barrier.

  10. Flexible thin-layer dielectric barrier discharge plasma treatment of pork butt and beef loin: effects on pathogen inactivation and meat-quality attributes.

    PubMed

    Jayasena, Dinesh D; Kim, Hyun Joo; Yong, Hae In; Park, Sanghoo; Kim, Kijung; Choe, Wonho; Jo, Cheorun

    2015-04-01

    The effects of a flexible thin-layer dielectric barrier discharge (DBD) plasma system using a sealed package on microbial inactivation and quality attributes of fresh pork and beef were tested. Following a 10-min treatment, the microbial-load reductions of Listeria monocytogenes, Escherichia coli O157:H7, and Salmonella Typhimurium were 2.04, 2.54, and 2.68 Log CFU/g in pork-butt samples and 1.90, 2.57, and 2.58 Log CFU/g in beef-loin samples, respectively. Colorimetric analysis showed that DBD-plasma treatment did not significantly affect L* values (lightness) of pork and beef samples, but lowered a* values (redness) significantly after 5- and 7.5-min exposures. The plasma treatment significantly influenced lipid oxidation only after a 10-min exposure. The texture of both types of meat was unaffected by plasma treatment. All sensory parameters of treated and non-treated samples were comparable except for taste, which was negatively influenced by the plasma treatment (P < 0.05). This thin-layer DBD-plasma system can be applied to inactivate foodborne pathogens. The observed minor deterioration of meat quality might be prevented by the use of hurdle technology.

  11. Broadband dielectric characterization of sapphire/TiOx/Ba₀.₃Sr₀.₇TiO₃ (111)-oriented thin films for the realization of a tunable interdigitated capacitor.

    PubMed

    Ghalem, Areski; Ponchel, Freddy; Remiens, Denis; Legier, Jean-Francois; Lasri, Tuami

    2013-05-01

    A complete microwave characterization up to 67 GHz using specific coplanar waveguides was performed to determine the dielectric properties (permittivity, losses, and tunability) of sapphire/TiOx/Ba0.3Sr0.7TiO3 (BST) (111)-oriented thin films. To that end, BaxSr1-xTiO3 thin films were deposited by RF magnetron sputtering on sapphire (0001) substrate. To control the preferred (111) orientation, a TiOx buffer layer was deposited on sapphire. According to the detailed knowledge of the material properties, it has been possible to conceive, fabricate, and test interdigitated capacitors, the basic element for future microwave tunable applications. Retention of capacitive behavior up to 67 GHz and a tunability of 32% at 67 GHz at an applied voltage of 30 V (150 kV/cm) were observed. The Q-factor remains greater than 30 over the entire frequency band. The possibility of a complete characterization of the material for the realization of high-performance interdigitated capacitors opens the door to microwave device fabrication.

  12. Progress in a-SiOx:H thin film solar cells with patterned MgF2 dielectric for top cell of multi-junction system

    NASA Astrophysics Data System (ADS)

    Kang, Dong-Won; Sichanugrist, Porponth; Konagai, Makoto

    2016-07-01

    We successfully designed and experimentally demonstrated an application of patterned MgF2 dielectric material at rear Al-doped ZnO (AZO)/Ag interface in thin film amorphous silicon oxide ( a-SiOx:H) solar cells. When it was realized in practical device process, MgF2 coverage with patterned morphology was employed to allow for current flow between the AZO and Ag against highly resistive MgF2 material. On the basis of the suggested structure, we found an improvement in quantum efficiency of the solar cells with the patterned MgF2. In addition, an enhancement of open circuit voltage ( V oc ) and fill factor ( FF) was observed. A remarkable increase in shunt resistance of the cells with the MgF2 would possibly indicate that the highly resistive MgF2 layer can partly suppress physical shunting across top and bottom electrodes caused by very thin absorber thickness of only 100 nm. The approach showed that our best-performing device revealed an essential improvement in conversion efficiency from 7.83 to 8.01% with achieving markedly high V oc (1.013 V) and FF (0.729). [Figure not available: see fulltext.

  13. Advancements in the characterization of 'hyper-thin' oxynitride gate dielectrics through exit wave reconstruction HRTEM and XPS

    SciTech Connect

    Principe, E.L.; Watson, D.G.; Kisielowski, C.

    2002-09-01

    The physical thickness of silicon oxynitride gate dielectric materials currently in development have dimensions in the range of 15-20 Angstrom ({approx}6-8 oxygen atoms), while approaching the dielectric constant equivalent oxide thickness (EOT) of 12 Angstrom silicon dioxide. These structures present serious challenges in meeting stringent requirements within the semiconductor industry for precise determination of thickness, interfacial roughness and chemical distribution. Limitations in conventional HRTEM must be removed that would minimize errors in such measurements. Our approach was to use the National Center for Electron Microscopy (NCEM) One Angstrom Microscope (O Angstrom M), together with focal series acquisition (FSA) and exit wave reconstruction (EWR) techniques to obtain <0.8A interpretable resolution. HRTEM data on the same oxynitride materials from an aberration corrected (Cs=0) microscope were also collected as part of this work, as were scanning TEM (STEM) measurements. The H RTEM characterization provides an absolute calibration and validation for a precise ''near-line'' metrology to determine gate oxide thickness and nitrogen dose using x-ray photoelectron spectroscopy (XPS).

  14. Study of Fluorine Addition Influence in the Dielectric Constant of Diamond-Like Carbon Thin Film Deposited by Reactive Sputtering

    NASA Astrophysics Data System (ADS)

    Trippe, S. C.; Mansano, R. D.

    The hydrogenated amorphous carbon films (a-C:H) or DLC (Diamond-Like Carbon) films are well known for exhibiting high electrical resistivity, low dielectric constant, high mechanical hardness, low friction coefficient, low superficial roughness and also for being inert. In this paper, we produced fluorinated DLC films (a-C:F), and studied the effect of adding CF4 on the above-mentioned properties of DLC films. These films were produced by a reactive RF magnetron sputtering system using a target of pure carbon in stable graphite allotrope. We performed measurements of electrical characteristic curves of capacitance as a function of applied tension (C-V) and current as a function of the applied tension (I-V). We showed the dielectric constant (k) and the resistivity (ρ) as functions of the CF4 concentration. On films with 65% CF4, we found that k = 2.7, and on films with 70% CF4, ρ = 12.3 × 1011 Ω cm. The value of the electrical breakdown field to films with 70% CF4 is 5.3 × 106 V/cm.

  15. The influence of strain on the dielectric behavior of (Ba, Sr) Ti{sub 1+x}O{sub 3} thin films grown by LS-MOCVD on Pt/SiO{sub 2}/Si.

    SciTech Connect

    Streiffer, S. K.

    1998-10-14

    The strain state and its coupling to dielectric behavior have been investigated for (100) BST thin films deposited on Pt/SiO{sub 2}/Si at 640 C. It is estimated from x-ray diffraction that the in-plane biaxial strain is approximately 0.7%. We postulate that this is of sufficient magnitude to confine any spontaneous polarization to the plane of the film. The thickness-corrected dielectric behavior perpendicular to the substrate for these samples shows evidence of coupling to such an in-plane phase transition at approximately 390K, as manifested by deviation from Curie-Weiss-like behavior at this temperature.

  16. Microwave Study of Field-Effect Devices Based on Graphene/Aluminum Nitride/Graphene Structures

    NASA Astrophysics Data System (ADS)

    Adabi, Mohammad; Lischner, Johannes; Hanham, Stephen M.; Mihai, Andrei P.; Shaforost, Olena; Wang, Rui; Hao, Ling; Petrov, Peter K.; Klein, Norbert

    2017-03-01

    Metallic gate electrodes are often employed to control the conductivity of graphene based field effect devices. The lack of transparency of such electrodes in many optical applications is a key limiting factor. We demonstrate a working concept of a double layer graphene field effect device that utilizes a thin film of sputtered aluminum nitride as dielectric gate material. For this system, we show that the graphene resistance can be modified by a voltage between the two graphene layers. We study how a second gate voltage applied to the silicon back gate modifies the measured microwave transport data at around 8.7 GHz. As confirmed by numerical simulations based on the Boltzmann equation, this system resembles a parallel circuit of two graphene layers with different intrinsic doping levels. The obtained experimental results indicate that the graphene-aluminum nitride-graphene device concept presents a promising technology platform for terahertz- to- optical devices as well as radio-frequency acoustic devices where piezoelectricity in aluminum nitride can also be exploited.

  17. Microwave Study of Field-Effect Devices Based on Graphene/Aluminum Nitride/Graphene Structures

    PubMed Central

    Adabi, Mohammad; Lischner, Johannes; Hanham, Stephen M.; Mihai, Andrei P.; Shaforost, Olena; Wang, Rui; Hao, Ling; Petrov, Peter K.; Klein, Norbert

    2017-01-01

    Metallic gate electrodes are often employed to control the conductivity of graphene based field effect devices. The lack of transparency of such electrodes in many optical applications is a key limiting factor. We demonstrate a working concept of a double layer graphene field effect device that utilizes a thin film of sputtered aluminum nitride as dielectric gate material. For this system, we show that the graphene resistance can be modified by a voltage between the two graphene layers. We study how a second gate voltage applied to the silicon back gate modifies the measured microwave transport data at around 8.7 GHz. As confirmed by numerical simulations based on the Boltzmann equation, this system resembles a parallel circuit of two graphene layers with different intrinsic doping levels. The obtained experimental results indicate that the graphene-aluminum nitride-graphene device concept presents a promising technology platform for terahertz- to- optical devices as well as radio-frequency acoustic devices where piezoelectricity in aluminum nitride can also be exploited. PMID:28276517

  18. Intrinsically stretchable and transparent thin-film transistors based on printable silver nanowires, carbon nanotubes and an elastomeric dielectric

    PubMed Central

    Liang, Jiajie; Li, Lu; Chen, Dustin; Hajagos, Tibor; Ren, Zhi; Chou, Shu-Yu; Hu, Wei; Pei, Qibing

    2015-01-01

    Thin-film field-effect transistor is a fundamental component behind various mordern electronics. The development of stretchable electronics poses fundamental challenges in developing new electronic materials for stretchable thin-film transistors that are mechanically compliant and solution processable. Here we report the fabrication of transparent thin-film transistors that behave like an elastomer film. The entire fabrication is carried out by solution-based techniques, and the resulting devices exhibit a mobility of ∼30 cm2 V−1 s−1, on/off ratio of 103–104, switching current >100 μA, transconductance >50 μS and relative low operating voltages. The devices can be stretched by up to 50% strain and subjected to 500 cycles of repeated stretching to 20% strain without significant loss in electrical property. The thin-film transistors are also used to drive organic light-emitting diodes. The approach and results represent an important progress toward the development of stretchable active-matrix displays. PMID:26173436

  19. Intrinsically stretchable and transparent thin-film transistors based on printable silver nanowires, carbon nanotubes and an elastomeric dielectric.

    PubMed

    Liang, Jiajie; Li, Lu; Chen, Dustin; Hajagos, Tibor; Ren, Zhi; Chou, Shu-Yu; Hu, Wei; Pei, Qibing

    2015-07-15

    Thin-film field-effect transistor is a fundamental component behind various mordern electronics. The development of stretchable electronics poses fundamental challenges in developing new electronic materials for stretchable thin-film transistors that are mechanically compliant and solution processable. Here we report the fabrication of transparent thin-film transistors that behave like an elastomer film. The entire fabrication is carried out by solution-based techniques, and the resulting devices exhibit a mobility of ∼30 cm(2) V(-1) s(-1), on/off ratio of 10(3)-10(4), switching current >100 μA, transconductance >50 μS and relative low operating voltages. The devices can be stretched by up to 50% strain and subjected to 500 cycles of repeated stretching to 20% strain without significant loss in electrical property. The thin-film transistors are also used to drive organic light-emitting diodes. The approach and results represent an important progress toward the development of stretchable active-matrix displays.

  20. Low-temperature growth of low friction wear-resistant amorphous carbon nitride thin films by mid-frequency, high power impulse, and direct current magnetron sputtering

    SciTech Connect

    Bakoglidis, Konstantinos D. Schmidt, Susann; Garbrecht, Magnus; Ivanov, Ivan G.; Jensen, Jens; Greczynski, Grzegorz; Hultman, Lars

    2015-09-15

    The potential of different magnetron sputtering techniques for the synthesis of low friction and wear resistant amorphous carbon nitride (a-CN{sub x}) thin films onto temperature-sensitive AISI52100 bearing steel, but also Si(001) substrates was studied. Hence, a substrate temperature of 150 °C was chosen for the film synthesis. The a-CN{sub x} films were deposited using mid-frequency magnetron sputtering (MFMS) with an MF bias voltage, high power impulse magnetron sputtering (HiPIMS) with a synchronized HiPIMS bias voltage, and direct current magnetron sputtering (DCMS) with a DC bias voltage. The films were deposited using a N{sub 2}/Ar flow ratio of 0.16 at the total pressure of 400 mPa. The negative bias voltage, V{sub s}, was varied from 20 to 120 V in each of the three deposition modes. The microstructure of the films was characterized by high-resolution transmission electron microscopy and selected area electron diffraction, while the film morphology was investigated by scanning electron microscopy. All films possessed an amorphous microstructure, while the film morphology changed with the bias voltage. Layers grown applying the lowest substrate bias of 20 V exhibited pronounced intercolumnar porosity, independent of the sputter technique. Voids closed and dense films are formed at V{sub s} ≥ 60 V, V{sub s} ≥ 100 V, and V{sub s} = 120 V for MFMS, DCMS, and HiPIMS, respectively. X-ray photoelectron spectroscopy revealed that the nitrogen-to-carbon ratio, N/C, of the films ranged between 0.2 and 0.24. Elastic recoil detection analysis showed that Ar content varied between 0 and 0.8 at. % and increased as a function of V{sub s} for all deposition techniques. All films exhibited compressive residual stress, σ, which depends on the growth method; HiPIMS produces the least stressed films with values ranging between −0.4 and −1.2 GPa for all V{sub s}, while CN{sub x} films deposited by MFMS showed residual stresses up to −4.2

  1. Semiconductor/dielectric interface engineering and characterization

    NASA Astrophysics Data System (ADS)

    Lucero, Antonio T.

    The focus of this dissertation is the application and characterization of several, novel interface passivation techniques for III-V semiconductors, and the development of an in-situ electrical characterization. Two different interface passivation techniques were evaluated. The first is interface nitridation using a nitrogen radical plasma source. The nitrogen radical plasma generator is a unique system which is capable of producing a large flux of N-radicals free of energetic ions. This was applied to Si and the surface was studied using x-ray photoelectron spectroscopy (XPS). Ultra-thin nitride layers could be formed from 200-400° C. Metal-oxide-semiconductor capacitors (MOSCAPs) were fabricated using this passivation technique. Interface nitridation was able to reduce leakage current and improve the equivalent oxide thickness of the devices. The second passivation technique studied is the atomic layer deposition (ALD) diethylzinc (DEZ)/water treatment of sulfur treated InGaAs and GaSb. On InGaAs this passivation technique is able to chemically reduce higher oxidation states on the surface, and the process results in the deposition of a ZnS/ZnO interface passivation layer, as determined by XPS. Capacitance-voltage (C-V) measurements of MOSCAPs made on p-InGaAs reveal a large reduction in accumulation dispersion and a reduction in the density of interfacial traps. The same technique was applied to GaSb and the process was studied in an in-situ half-cycle XPS experiment. DEZ/H2O is able to remove all Sb-S from the surface, forming a stable ZnS passivation layer. This passivation layer is resistant to further reoxidation during dielectric deposition. The final part of this dissertation is the design and construction of an ultra-high vacuum cluster tool for in-situ electrical characterization. The system consists of three deposition chambers coupled to an electrical probe station. With this setup, devices can be processed and subsequently electrically characterized

  2. High performance p-type organic thin film transistors with an intrinsically photopatternable, ultrathin polymer dielectric layer☆

    PubMed Central

    Petritz, Andreas; Wolfberger, Archim; Fian, Alexander; Krenn, Joachim R.; Griesser, Thomas; Stadlober, Barbara

    2013-01-01

    A high-performing bottom-gate top-contact pentacene-based oTFT technology with an ultrathin (25–48 nm) and electrically dense photopatternable polymeric gate dielectric layer is reported. The photosensitive polymer poly((±)endo,exo-bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid, diphenylester) (PNDPE) is patterned directly by UV-exposure (λ = 254 nm) at a dose typical for conventionally used negative photoresists without the need for any additional photoinitiator. The polymer itself undergoes a photo-Fries rearrangement reaction under UV illumination, which is accompanied by a selective cross-linking of the macromolecules, leading to a change in solubility in organic solvents. This crosslinking reaction and the negative photoresist behavior are investigated by means of sol–gel analysis. The resulting transistors show a field-effect mobility up to 0.8 cm2 V−1 s−1 at an operation voltage as low as −4.5 V. The ultra-low subthreshold swing in the order of 0.1 V dec−1 as well as the completely hysteresis-free transistor characteristics are indicating a very low interface trap density. It can be shown that the device performance is completely stable upon UV-irradiation and development according to a very robust chemical rearrangement. The excellent interface properties, the high stability and the small thickness make the PNDPE gate dielectric a promising candidate for fast organic electronic circuits. PMID:24748853

  3. Crystalline boron nitride aerogels

    DOEpatents

    Zettl, Alexander K.; Rousseas, Michael; Goldstein, Anna P.; Mickelson, William; Worsley, Marcus A.; Woo, Leta

    2017-04-04

    This disclosure provides methods and materials related to boron nitride aerogels. In one aspect, a material comprises an aerogel comprising boron nitride. The boron nitride has an ordered crystalline structure. The ordered crystalline structure may include atomic layers of hexagonal boron nitride lying on top of one another, with atoms contained in a first layer being superimposed on atoms contained in a second layer.

  4. Control of Nanoplane Orientation in voBN for High Thermal Anisotropy in a Dielectric Thin Film: A New Solution for Thermal Hotspot Mitigation in Electronics.

    PubMed

    Cometto, Olivier; Samani, Majid K; Liu, Bo; Sun, Shuangxi; Tsang, Siu Hon; Liu, Johan; Zhou, Kun; Teo, Edwin H T

    2017-03-01

    High anisotropic thermal materials, which allow heat to dissipate in a preferential direction, are of interest as a prospective material for electronics as an effective thermal management solution for hot spots. However, due to their preferential heat propagation in the in-plane direction, the heat spreads laterally instead of vertically. This limitation makes these materials ineffective as the density of hot spots increases. Here, we produce a new dielectric thin film material at room temperature, named vertically ordered nanocrystalline h-BN (voBN). It is produced such that its preferential thermally conductive direction is aligned in the vertical axis, which facilitates direct thermal extraction, thereby addressing the increasing challenge of thermal crosstalk. The uniqueness of voBN comes from its h-BN nanocrystals where all their basal planes are aligned in the direction normal to the substrate plane. Using the 3ω method, we show that voBN exhibits high anisotropic thermal conductivity (TC) with a 16-fold difference between through-film TC and in-plane TC (respectively 4.26 and 0.26 W·m(-1)·K(-1)). Molecular dynamics simulations also concurred with the experimental data, showing that the origin of this anisotropic behavior is due to the nature of voBN's plane ordering. While the consistent vertical ordering provides an uninterrupted and preferred propagation path for phonons in the through-film direction, discontinuity in the lateral direction leads to a reduced in-plane TC. In addition, we also use COMSOL to simulate how the dielectric and thermal properties of voBN enable an increase in hot spot density up to 295% compared with SiO2, without any temperature increase.

  5. Interpretation of transmission through type II superconducting thin film on dielectric substrate as observed by laser thermal spectroscopy

    NASA Astrophysics Data System (ADS)

    Šindler, M.; Tesař, R.; Koláček, J.; Skrbek, L.

    2012-12-01

    We provide a thorough analysis of THz properties of BCS-like superconducting thin films. Temperature and frequency dependence of complex conductivity in zero magnetic field is discussed by utilizing the Zimmerman et al. explicit BCS based formula [Physica C 183 (1991) 99]. We extend this approach by employing the effective medium theory and develop a phenomenological model capable of accounting for the influence of external magnetic field. Using Yeh powerful formalism [Surface Sci. 96 (1980) 41] we calculate optical transmission of linearly polarized laser beam normally incident to a multilayered sample consisting of a thin NbN film grown on birefringent sapphire substrate, entirely covering ranges of interest in temperature and frequency. A proposal to exploit linear polarization of the incident beam parallel with principal axes of conductivity tensor is explained and theoretical predictions for a realistic NbN sample are computed and discussed.

  6. The Relationship Between Chemical Structure and Dielectric Properties of Plasma-Enhanced Chemical Vapor Deposited Polymer Thin Films (Postprint)

    DTIC Science & Technology

    2007-01-01

    POLYMER THIN FILMS (POSTPRINT) Kurt Eyink, Jesse Enlow , and Timothy J. Bunning Hardened Materials Branch Survivability and Sensor Materials...Materials Sci & Tech Applications, LLC) N. Venkatasubramanian and John T. Grant (University of Dayton) Kurt Eyink, Jesse Enlow , and Timothy J. Bunning...John T. Grant c, Kurt Eyink a, Kevin Wiacek d, Sandra Fries-Carr d, Jesse Enlow a, Timothy J. Bunning a a Air Force Research Laboratory, Materials

  7. Boron nitride composites

    DOEpatents

    Kuntz, Joshua D.; Ellsworth, German F.; Swenson, Fritz J.; Allen, Patrick G.

    2017-02-21

    According to one embodiment, a composite product includes: a matrix material including hexagonal boron nitride and one or more borate binders; and a plurality of cubic boron nitride particles dispersed in the matrix material. According to another embodiment, a composite product includes: a matrix material including hexagonal boron nitride and amorphous boron nitride; and a plurality of cubic boron nitride particles dispersed in the matrix material.

  8. Electrochemical Solution Growth of Magnetic Nitrides

    SciTech Connect

    Monson, Todd C.; Pearce, Charles

    2014-10-01

    Magnetic nitrides, if manufactured in bulk form, would provide designers of transformers and inductors with a new class of better performing and affordable soft magnetic materials. According to experimental results from thin films and/or theoretical calculations, magnetic nitrides would have magnetic moments well in excess of current state of the art soft magnets. Furthermore, magnetic nitrides would have higher resistivities than current transformer core materials and therefore not require the use of laminates of inactive material to limit eddy current losses. However, almost all of the magnetic nitrides have been elusive except in difficult to reproduce thin films or as inclusions in another material. Now, through its ability to reduce atmospheric nitrogen, the electrochemical solution growth (ESG) technique can bring highly sought after (and previously inaccessible) new magnetic nitrides into existence in bulk form. This method utilizes a molten salt as a solvent to solubilize metal cations and nitrogen ions produced electrochemically and form nitrogen compounds. Unlike other growth methods, the scalable ESG process can sustain high growth rates (~mm/hr) even under reasonable operating conditions (atmospheric pressure and 500 °C). Ultimately, this translates into a high throughput, low cost, manufacturing process. The ESG process has already been used successfully to grow high quality GaN. Below, the experimental results of an exploratory express LDRD project to access the viability of the ESG technique to grow magnetic nitrides will be presented.

  9. Origin of colossal dielectric response of CaCu3Ti4O12 studied by using CaTiO3/CaCu3Ti4O12/CaTiO3 multilayer thin films

    NASA Astrophysics Data System (ADS)

    Mitsugi, Masakazu; Asanuma, Shutaro; Uesu, Yoshiaki; Fukunaga, Mamoru; Kobayashi, Wataru; Terasaki, Ichiro

    2007-06-01

    To elucidate the origin of the colossal dielectric response (CDR) of CaCu3Ti4O12 (CCTO), multilayer thin films of CCTO interposed in insulating CaTiO3 (CTO) were synthesized using a pulsed laser deposition technique. The capacitance C of CTO/CCTO/CTO films with different layer thicknesses is measured. After removing the capacitance of CTO by extrapolating C to zero CTO thickness, the real part of dielectric constant of CCTO is estimated to be 329-435, which is much smaller than the reported value for CCTO thin films. This fact indicates that the CDR of CCTO is extrinsic and originates from an internal barrier layer capacitor.

  10. CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY: Growth Related Carrier Mobility Enhancement of Pentacene Thin-Film Transistors with High-k Oxide Gate Dielectric

    NASA Astrophysics Data System (ADS)

    Yu, Ai-Fang; Qi, Qiong; Jiang, Peng; Jiang, Chao

    2009-07-01

    Carrier mobility enhancement from 0.09 to 0.59 cm2/Vs is achieved for pentacene-based thin-film transistors (TFTs) by modifying the HfO2 gate dielectric with a polystyrene (PS) thin film. The improvement of the transistor's performance is found to be strongly related to the initial film morphologies of pentacene on the dielectrics. In contrast to the three-dimensional island-like growth mode on the HfO2 surface, the Stranski-Krastanov growth mode on the smooth and nonpolar PS/HfO2 surface is believed to be the origin of the excellent carrier mobility of the TFTs. A large well-connected first monolayer with fewer boundaries is formed via the Stranski-Krastanov growth mode, which facilitates a charge transport parallel to the substrate and promotes higher carrier mobility.

  11. Nitridation and CVD reactions with hydrazine

    SciTech Connect

    Vogt, K.W.; Kohl, P.A.; Abys, J.A.

    1995-10-01

    The low-temperature nitridation of gallium arsenide, silicon and transition metals was investigated using hydrazine. Gallium nitride films were grown on gallium arsenide (GaAs) by direct reaction of the semiconductor surface layers with hydrazine at 200--400 C. Auger electron spectroscopy and X-ray photoelectron spectroscopy (XPS) analyses show that the films are primarily gallium nitride with a small oxide impurity. Thin nitride films ({approximately}15{angstrom}) were grown on silicon by reaction with hydrazine at 300--500 C. Ellipsometry results suggest that the film growth goes through different phases following linear, parabolic and logarithmic functions with time. XPS analysis shows that the nitride films could be formed at much lower temperatures than possible with ammonia (300 vs. 600 C). The formation of numerous transition metal nitrides (Co, Cr, Fe, Mo, Si, Ta, Ti, V, and W) by reaction with hydrazine at 400 C is demonstrated, as well as the chemical vapor deposition of boron nitride films from diborane and hydrazine reactants. The temperature at the mixing point was critical in determining the final composition of the film. A 1-D transport model suggests that the reaction rate at 400 C was kinetically limited. The results also agree qualitatively with thermodynamic equilibrium calculations.

  12. Influence of annealing temperature on electronic and dielectric properties of ZrO2 thin films on Si

    NASA Astrophysics Data System (ADS)

    Uthanna, S.; Kondaiah, P.; Madhavi, V.; Rao, G. Mohan

    2012-06-01

    Zirconium oxide (ZrO2) films were deposited on (100) silicon substrates by DC reactive magnetron sputtering of zirconium target at an oxygen partial pressure of 6 × 10-2 Pa. The as-deposited films were annealed in air for 1 hour at different temperatures in the range 773 - 1173 K. The influence of annealing temperature on the structural properties of ZrO2 films and the electrical properties like Capacitance-Voltage and Current-Voltage of the capacitors of the type Al/ZrO2/p-Si were studied. The capacitance and dielectric constant of the capacitors were found to increase with increase in annealing temperature from 773 to 973 K, however, with further increase in annealing temperature to 1173 K they were found to decrease. In addition, the leakage current density was decreased from 1 × 10-6 to 4 × 10-7 A/cm2 at 1V gate bias voltage and the electrical conduction mechanism was dominated by Schottky emission for all the films in lower electric fields.

  13. Spectral, structural, optical and dielectrical studies of UV irradiated Rose Bengal thin films prepared by spin coating technique

    NASA Astrophysics Data System (ADS)

    Zeyada, H. M.; Youssif, M. I.; El-Ghamaz, N. A.; Aboderbala, M. E. O.

    2017-02-01

    Optical properties of pristine and UV irradiated Rose Bengal (RB) films have been investigated using transmittance and reflectance methods. The refractive index(n) and extinction coefficient (k) have been calculated from the absolute values of transmission and reflection spectrum. Single oscillator parameters and Drude model of free carrier absorption have been applied for analysis of the refractive index dispersion. Within the frame work of the band-to-band electron transitions theory; the fundamental absorption edge data were analyzed. Our results suggest that thickness of RB films has no effect on the absorption or the refractive indices in the investigated thicknesses range and within the experimental error. Structural transformation of films from amorphous to polycrystalline has been observed upon UV irradiation. Accordingly, the decreases of all of the absorption coefficient, the energy gap and the refractive index of RB films have been detected. Furthermore, the dependence of the optical functions on UV exposure times has been discussed based on the spectral distribution of the dielectric constant.

  14. Influence of annealing temperature on electronic and dielectric properties of ZrO{sub 2} thin films on Si

    SciTech Connect

    Uthanna, S.; Kondaiah, P.; Madhavi, V.; Rao, G. Mohan

    2012-06-25

    Zirconium oxide (ZrO{sub 2}) films were deposited on (100) silicon substrates by DC reactive magnetron sputtering of zirconium target at an oxygen partial pressure of 6 Multiplication-Sign 10{sup -2} Pa. The as-deposited films were annealed in air for 1 hour at different temperatures in the range 773 - 1173 K. The influence of annealing temperature on the structural properties of ZrO{sub 2} films and the electrical properties like Capacitance-Voltage and Current-Voltage of the capacitors of the type Al/ZrO{sub 2}/p-Si were studied. The capacitance and dielectric constant of the capacitors were found to increase with increase in annealing temperature from 773 to 973 K, however, with further increase in annealing temperature to 1173 K they were found to decrease. In addition, the leakage current density was decreased from 1 Multiplication-Sign 10{sup -6} to 4 Multiplication-Sign 10{sup -7} A/cm{sup 2} at 1V gate bias voltage and the electrical conduction mechanism was dominated by Schottky emission for all the films in lower electric fields.

  15. Silicon nitride protective coatings for silvered glass mirrors

    DOEpatents

    Tracy, C.E.; Benson, D.K.

    1984-07-20

    A protective diffusion barrier for metalized mirror structures is provided by a layer or coating of silicon nitride which is a very dense, transparent, dielectric material that is impervious to water, alkali, and other impurities and corrosive substances that typically attack the metal layers of mirrors and cause degradation of the mirrors' reflectivity. The silicon nitride layer can be deposited on the substrate prior to metal deposition thereon to stabilize the metal/substrate interface, and it can be deposited over the metal to encapsulate it and protect the metal from corrosion or other degradation. Mirrors coated with silicon nitride according to this invention can also be used as front surface mirrors.

  16. Effect of Stacking Layers on the Microwave Dielectric Properties of (Li0.5Sm0.5)TiO3/CaTiO3 Thin Films

    NASA Astrophysics Data System (ADS)

    Lee, Byoung Duk; Lee, Hong Ryul; Yoon, Ki Hyun; Kang, Dong Heon

    2005-03-01

    Effect of stacking layers on the microwave dielectric properties of the (Li0.5Sm0.5)TiO3/CaTiO3 (LSTO/CTO) thin films prepared by the metalorganic solution deposition technique (MOSD) was investigated. The dielectric constant (K), dielectric loss (\\tanδ) and temperature coefficient of dielectric constant (TCK) of CaTiO3 films measured at 6 GHz were 160, 0.003 and -1340 ppm/°C, respectively. In contrast, the (Li0.5Sm0.5)TiO3 films showed K of 35, \\tanδ of 0.001 and TCK of +320 ppm/°C. As the thickness of CTO layer in the LSTO/CTO films increased, K increased and TCK changed from positive values to negative values by dielectric mixing rule. Especially, LSTO(200 nm)/CTO(200 nm) films exhibited TCK of +10 ppm/°C, indicating temperature stability. The \\tanδ of LSTO/CTO films increased with increasing the thickness of CTO layer. This result was attributed to the fact that the stresses were induced by the higher thermal-expansion coefficient of CTO than that of LSTO. Also, as compared with LSTO(200 nm)/CTO(200 nm) film, the K and \\textit{TCK} of LSTO(100 nm)/CTO(200 nm)/LSTO(100 nm) film were not changed, but the dielectric loss increased. This result indicated that the dielectric loss was affected by the number of interfaces between CTO and LSTO layers.

  17. Effect of process parameters and post-deposition annealing on the microwave dielectric and optical properties of pulsed laser deposited Bi1.5Zn1.0Nb1.5O7 thin films

    NASA Astrophysics Data System (ADS)

    Sudheendran, K.; Ghanashyam Krishna, M.; Raju, K. C. James

    2009-05-01

    Bismuth Zinc niobate (Bi1.5Zn1.0Nb1.5O7) thin films were deposited by pulsed laser deposition (PLD) method on fused silica substrates at different oxygen pressures. The structural, microwave dielectric and optical properties of these thin films were systematically studied for both the as-deposited and the annealed films at 600°C. The as-deposited films were all amorphous in nature but crystallized on annealing at 600°C in air. The surface morphology as studied by atomic force microscopy (AFM) reveals ultra-fine grains in the case of as-deposited thin films and cluster grain morphology on annealing. The as-deposited films exhibit refractive index in the range of 2.36-2.53 (at a wavelength of 750 nm) with an optical absorption edge value of 3.30-3.52 eV and a maximum dielectric constant of 11 at 12.15 GHz. On annealing the films at 600°C they crystallize to the cubic pyrochlore structure accompanied by an increase in band gap, refractive index and microwave dielectric constant.

  18. The consequences of air flow on the distribution of aqueous species during dielectric barrier discharge treatment of thin water layers

    NASA Astrophysics Data System (ADS)

    Tian, Wei; Lietz, Amanda M.; Kushner, Mark J.

    2016-10-01

    The desired outcomes of wet tissue treatment by dielectric barrier discharges (DBDs) strongly depend on the integrated fluences of reactive species incident onto the tissue, which are determined by power, frequency and treatment time. The reactivity produced by such plasmas is often expected to be proportional to treatment time due to the accumulation of radicals in the liquid over the tissue. However, one of the typically uncontrolled parameters in DBD treatment of liquids and tissue is gas flow, which could affect the delivery of plasma produced radicals to the tissue. Gas flow can redistribute long-lived, plasma produced gas phase species prior to solvating in the liquid, while not greatly affecting the solvation of short-lived species. Gas flow can therefore potentially be a control mechanism for tailoring the fluences of reactive species to the tissue. In this paper, we report on a computational investigation of the consequences of gas flow on treatment of liquid layers covering tissue by atmospheric DBDs by up to 100 pulses. We found that gas flow (through residence time of the gas) can control the production of gas phase species requiring many collisions to form, such as reactive nitrogen species (RNS). The resulting solvation of the RNS in turn controls the production of aqueous species such as \\text{NO}\\text{3aq}- and \\text{ONOO}\\text{aq}- (aq denotes an aqueous species). With the exception of O3 and O3aq, reactive oxygen species (ROS) are less sensitive to gas flow, and so OHaq and H2O2aq, are determined primarily by discharge properties.

  19. Barrier Modification of Metal-contact on Silicon by Sub-2 nm Platinum Nanoparticles and Thin Dielectrics

    PubMed Central

    Zheng, Haisheng; Mahajan, Bikram K.; Su, Sheng C.; Mukherjee, Somik; Gangopadhyay, Keshab; Gangopadhyay, Shubhra

    2016-01-01

    We report metal/p-Si contact barrier modification through the introduction of either “isolated” or “nonisolated” tilted-target-sputtered sub-2 nm platinum nanoparticles (Pt NPs) in combination with either a 0.98 nm Atomic Layer Deposited Al2O3 or a 1.6 nm chemically grown SiO2 dielectric layer, or both. Here, we study the role of these Pt NP’s size dependent properties, i.e., the Pt NP-metal surface dipole, the Coulomb blockade and quantum confinement effect in determining the degree of Fermi level depinning observed at the studied metal/p-Si interfaces. By varying only the embedded Pt NP size and its areal density, the nature of the contact can also be modulated to be either Schottky or Ohmic upon utilizing the same gate metal. 0.74 nm Pt NPs with an areal density of 1.1 × 1013 cm−2 show ~382 times higher current densities compared to the control sample embedded with similarly sized Pt NPs with ~1.6 times lower areal densities. We further demonstrate that both Schottky (Ti/p-Si) and poor Ohmic (Au/p-Si) contact can be modulated into a good Ohmic contact with current density of 18.7 ± 0.6 A/cm2 and 10.4 ± 0.4 A/cm2, respectively, showing ~18 and ~30 times improvement. A perfect forward/reverse current ratio of 1.041 is achieved for these low doped p-Si samples. PMID:27121605

  20. Multilayer Thin-Film Microcapacitors

    NASA Technical Reports Server (NTRS)

    Thakoor, Sarita; Thakoor, Anil; Karmon, Dan

    1995-01-01

    Miniature capacitors containing multiple alternating thin-film dielectric and metal layers proposed, especially for use in integrated and hybrid electronic circuits. Because capacitance inversely proportional to thickness of dielectric layers, use of thin, high-quality dielectric layers affords capacitance and energy-storage densities much greater than now available. These devices much smaller and more reliable than state-of-art capacitors.