Novel contact hole reticle design for enhanced lithography process window in IC manufacturing

NASA Astrophysics Data System (ADS)

Chang, Chung-Hsing

2004-10-01

For 90nm node generation, 65nm, and beyond, dark field mask types such as contact-hole, via, and trench patterns that all are very challenging to print with satisfactory process windows for day-to-day lithography manufacturing. Resolution enhancement technology (RET) masks together with ArF high numerical aperture (NA) scanners have been recognized as the inevitable choice of method for 65nm node manufacturing. Among RET mask types, the alternating phase shifting mask (AltPSM) is one of the well-known strong enhancement techniques. However, AltPSM can have a very strong optical proximity effect that comes with the use of small on-axis illumination sigma setting. For very dense contact features, it may be possible for AltPSM to overcome the phase conflict by limiting the mask design rules. But it is not feasible to resolve the inherent phase conflict for the semi-dense, semi-isolated and isolated contact areas. Hence the adoption of this strong enhancement technique for dark filed mask types in today"s IC manufacturing has been very limited. In this paper, we report a novel yet a very powerful design method to achieve contact and via masks printing for 90nm, 65nm, and beyond. We name our new mask design as: Novel Improved Contact-hole pattern Exposure PSM (NICE PSM) with off-axis illumination, such as QUASAR. This RET masks design can enhance the process window of isolated, semi-isolated contact hole and via hole patterns. The main concepts of NICE PSM with QUASAR off-axis illumination are analogous to the Super-FLEX pupil filter technology.

Fourier domain mode locking at 1050 nm for ultra-high-speed optical coherence tomography of the human retina at 236,000 axial scans per second.

PubMed

Huber, R; Adler, D C; Srinivasan, V J; Fujimoto, J G

2007-07-15

A Fourier domain mode-locked (FDML) laser at 1050 nm for ultra-high-speed optical coherence tomography (OCT) imaging of the human retina is demonstrated. Achievable performance, physical limitations, design rules, and scaling principles for FDML operation and component choice in this wavelength range are discussed. The fiber-based FDML laser operates at a sweep rate of 236 kHz over a 63 nm tuning range, with 7 mW average output power. Ultra-high-speed retinal imaging is demonstrated at 236,000 axial scans per second. This represents a speed improvement of approximately10x over typical high-speed OCT systems, paving the way for densely sampled volumetric data sets and new imaging protocols.

Signal-chip microcomputer control system for a diffraction grating ruling engine

NASA Astrophysics Data System (ADS)

Wang, Xiaolin; Zhang, Yuhua; Yang, Houmin; Guo, Du

1998-08-01

A control system with a chip of 8031 single-chip microcomputer as its nucleus for a diffraction grating ruling engine has been developed, its hardware and software are presented in this paper. A series of techniques such as program-controlled amplifier and interference fringes subdivision as well as motor velocity step governing are adopted to improve the control accuracy. With this control system, 8 kinds of gratings of different spacings can be ruled, the positioning precision of the diffraction grating ruling engine (sigma) equals 3.6 nm, and the maximum positioning error is less than 14.6 nm.

Energy-efficient neuron, synapse and STDP integrated circuits.

PubMed

Cruz-Albrecht, Jose M; Yung, Michael W; Srinivasa, Narayan

2012-06-01

Ultra-low energy biologically-inspired neuron and synapse integrated circuits are presented. The synapse includes a spike timing dependent plasticity (STDP) learning rule circuit. These circuits have been designed, fabricated and tested using a 90 nm CMOS process. Experimental measurements demonstrate proper operation. The neuron and the synapse with STDP circuits have an energy consumption of around 0.4 pJ per spike and synaptic operation respectively.

Pre-PDK block-level PPAC assessment of technology options for sub-7nm high-performance logic

NASA Astrophysics Data System (ADS)

Liebmann, L.; Northrop, G.; Facchini, M.; Riviere Cazaux, L.; Baum, Z.; Nakamoto, N.; Sun, K.; Chanemougame, D.; Han, G.; Gerousis, V.

2018-03-01

This paper describes a rigorous yet flexible standard cell place-and-route flow that is used to quantify block-level power, performance, and area trade-offs driven by two unique cell architectures and their associated design rule differences. The two architectures examined in this paper differ primarily in their use of different power-distribution-networks to achieve the desired circuit performance for high-performance logic designs. The paper shows the importance of incorporating block-level routability experiments in the early phases of design-technology co-optimization by reviewing a series of routing trials that explore different aspects of the technology definition. Since the electrical and physical parameters leading to critical process assumptions and design rules are unique to specific integration schemes and design objectives, it is understood that the goal of this work is not to promote one cell-architecture over another, but rather to convey the importance of exploring critical trade-offs long before the process details of the technology node are finalized to a point where a process design kit can be published.

Designing Light Beam Transmittance Measuring Tool Using a Laser Pointer

NASA Astrophysics Data System (ADS)

Nuroso, H.; Kurniawan, W.; Marwoto, P.

2016-08-01

A simple instrument used for measuring light beam transmittance percentage made of window film has been developed. The instrument uses a laser pointer of 405 nm and 650 nm ±10% as a light source. Its accuracy approaches 80%. Transmittance data was found by comparing the light beam before and after passing the window film. The light intensity measuring unit was deleted by splitting the light source into two beams through a beam splitter. The light beam was changed into resistance by a NORP12 LDR sensor designed at a circuit of voltage divider rule of Khirchoff's laws. This conversion system will produce light beam intensity received by the sensor to become an equal voltage. This voltage will, then, be presented on the computer screen in the form of a real time graph via a 2.0 USB data transfer.

CHAM: weak signals detection through a new multivariate algorithm for process control

NASA Astrophysics Data System (ADS)

Bergeret, François; Soual, Carole; Le Gratiet, B.

2016-10-01

Derivatives technologies based on core CMOS processes are significantly aggressive in term of design rules and process control requirements. Process control plan is a derived from Process Assumption (PA) calculations which result in a design rule based on known process variability capabilities, taking into account enough margin to be safe not only for yield but especially for reliability. Even though process assumptions are calculated with a 4 sigma known process capability margin, efficient and competitive designs are challenging the process especially for derivatives technologies in 40 and 28nm nodes. For wafer fab process control, PA are declined in monovariate (layer1 CD, layer2 CD, layer2 to layer1 overlay, layer3 CD etc….) control charts with appropriated specifications and control limits which all together are securing the silicon. This is so far working fine but such system is not really sensitive to weak signals coming from interactions of multiple key parameters (high layer2 CD combined with high layer3 CD as an example). CHAM is a software using an advanced statistical algorithm specifically designed to detect small signals, especially when there are many parameters to control and when the parameters can interact to create yield issues. In this presentation we will first present the CHAM algorithm, then the case-study on critical dimensions, with the results, and we will conclude on future work. This partnership between Ippon and STM is part of E450LMDAP, European project dedicated to metrology and lithography development for future technology nodes, especially 10nm.

Route towards cylindrical cloaking at visible frequencies using an optimization algorithm

NASA Astrophysics Data System (ADS)

Rottler, Andreas; Krüger, Benjamin; Heitmann, Detlef; Pfannkuche, Daniela; Mendach, Stefan

2012-12-01

We derive a model based on the Maxwell-Garnett effective-medium theory that describes a cylindrical cloaking shell composed of metal rods which are radially aligned in a dielectric host medium. We propose and demonstrate a minimization algorithm that calculates for given material parameters the optimal geometrical parameters of the cloaking shell such that its effective optical parameters fit the best to the required permittivity distribution for cylindrical cloaking. By means of sophisticated full-wave simulations we find that a cylindrical cloak with good performance using silver as the metal can be designed with our algorithm for wavelengths in the red part of the visible spectrum (623nm <λ<773nm). We also present a full-wave simulation of such a cloak at an exemplary wavelength of λ=729nm (ℏω=1.7eV) which indicates that our model is useful to find design rules of cloaks with good cloaking performance. Our calculations investigate a structure that is easy to fabricate using standard preparation techniques and therefore pave the way to a realization of guiding light around an object at visible frequencies, thus rendering it invisible.

1D design style implications for mask making and CEBL

NASA Astrophysics Data System (ADS)

Smayling, Michael C.

2013-09-01

At advanced nodes, CMOS logic is being designed in a highly regular design style because of the resolution limitations of optical lithography equipment. Logic and memory layouts using 1D Gridded Design Rules (GDR) have been demonstrated to nodes beyond 12nm.[1-4] Smaller nodes will require the same regular layout style but with multiple patterning for critical layers. One of the significant advantages of 1D GDR is the ease of splitting layouts into lines and cuts. A lines and cuts approach has been used to achieve good pattern fidelity and process margin to below 12nm.[4] Line scaling with excellent line-edge roughness (LER) has been demonstrated with self-aligned spacer processing.[5] This change in design style has important implications for mask making: • The complexity of the masks will be greatly reduced from what would be required for 2D designs with very complex OPC or inverse lithography corrections. • The number of masks will initially increase, as for conventional multiple patterning. But in the case of 1D design, there are future options for mask count reduction. • The line masks will remain simple, with little or no OPC, at pitches (1x) above 80nm. This provides an excellent opportunity for continual improvement of line CD and LER. The line pattern will be processed through a self-aligned pitch division sequence to divide pitch by 2 or by 4. • The cut masks can be done with "simple OPC" as demonstrated to beyond 12nm.[6] Multiple simple cut masks may be required at advanced nodes. "Coloring" has been demonstrated to below 12nm for two colors and to 8nm for three colors. • Cut/hole masks will eventually be replaced by e-beam direct write using complementary e-beam lithography (CEBL).[7-11] This transition is gated by the availability of multiple column e-beam systems with throughput adequate for high- volume manufacturing. A brief description of 1D and 2D design styles will be presented, followed by examples of 1D layouts. Mask complexity for 1D layouts patterned directly will be compared to mask complexity for lines and cuts at nodes larger than 20nm. No such comparison is possible below 20nm since single-patterning does not work below ~80nm pitch using optical exposure tools. Also discussed will be recently published wafer results for line patterns with pitch division by-2 and by-4 at sub-12nm nodes, plus examples of post-etch results for 1D patterns done with cut masks and compared to cuts exposed by a single-column e-beam direct write system.

OPC for curved designs in application to photonics on silicon

NASA Astrophysics Data System (ADS)

Orlando, Bastien; Farys, Vincent; Schneider, Loïc.; Cremer, Sébastien; Postnikov, Sergei V.; Millequant, Matthieu; Dirrenberger, Mathieu; Tiphine, Charles; Bayle, Sébastian; Tranquillin, Céline; Schiavone, Patrick

2016-03-01

Today's design for photonics devices on silicon relies on non-Manhattan features such as curves and a wide variety of angles with minimum feature size below 100nm. Industrial manufacturing of such devices requires optimized process window with 193nm lithography. Therefore, Resolution Enhancement Techniques (RET) that are commonly used for CMOS manufacturing are required. However, most RET algorithms are based on Manhattan fragmentation (0°, 45° and 90°) which can generate large CD dispersion on masks for photonic designs. Industrial implementation of RET solutions to photonic designs is challenging as most currently available OPC tools are CMOS-oriented. Discrepancy from design to final results induced by RET techniques can lead to lower photonic device performance. We propose a novel sizing algorithm allowing adjustment of design edge fragments while preserving the topology of the original structures. The results of the algorithm implementation in the rule based sizing, SRAF placement and model based correction will be discussed in this paper. Corrections based on this novel algorithm were applied and characterized on real photonics devices. The obtained results demonstrate the validity of the proposed correction method integrated in Inscale software of Aselta Nanographics.

Nanoparticle Superlattice Engineering with DNA

NASA Astrophysics Data System (ADS)

Mirkin, Chad

2012-02-01

Recent developments in strategies for assembling nanomaterials have allowed us to draw a direct analogy between the assembly of solid state atomic lattices and the construction of nanoparticle superlattices. Herein, we present a set of six design rules for using DNA as a programmable linker to deliberately stabilize nine distinct colloidal crystal structures, with lattice parameters that are tailorable over the 25-150 nm size regime. These rules are analogous to those put forth by Pauling decades ago to explain the relative stability of lattices composed of atoms and small molecules. It is ideal to use DNA as a nanoscale bond to connect nanoparticles to achieve colloidal superlattice structures in this system, since its programmable nature allows for facile control over nanoparticle bond length and strength, and nanoparticle bond selectivity. This assembly method affords simultaneous and independent control over nanoparticle structure, crystallographic symmetry, and lattice parameters with nanometer scale precision. Further, we have developed a phase diagram that predicts the design parameters necessary to achieve a lattice with a given symmetry and lattice parameters a priori. The rules developed in this work present a major advance towards true materials by design, as they effectively separate the identity of a particle core (and thereby its physical properties) from the variables that control its assembly.

N7 logic via patterning using templated DSA: implementation aspects

NASA Astrophysics Data System (ADS)

Bekaert, J.; Doise, J.; Gronheid, R.; Ryckaert, J.; Vandenberghe, G.; Fenger, G.; Her, Y. J.; Cao, Y.

2015-07-01

In recent years, major advancements have been made in the directed self-assembly (DSA) of block copolymers (BCP). Insertion of DSA for IC fabrication is seriously considered for the 7 nm node. At this node the DSA technology could alleviate costs for multiple patterning and limit the number of masks that would be required per layer. At imec, multiple approaches for inserting DSA into the 7 nm node are considered. One of the most straightforward approaches for implementation would be for via patterning through templated DSA; a grapho-epitaxy flow using cylindrical phase BCP material resulting in contact hole multiplication within a litho-defined pre-pattern. To be implemented for 7 nm node via patterning, not only the appropriate process flow needs to be available, but also DSA-aware mask decomposition is required. In this paper, several aspects of the imec approach for implementing templated DSA will be discussed, including experimental demonstration of density effect mitigation, DSA hole pattern transfer and double DSA patterning, creation of a compact DSA model. Using an actual 7 nm node logic layout, we derive DSA-friendly design rules in a logical way from a lithographer's view point. A concrete assessment is provided on how DSA-friendly design could potentially reduce the number of Via masks for a place-and-routed N7 logic pattern.

65nm OPC and design optimization by using simple electrical transistor simulation

NASA Astrophysics Data System (ADS)

Trouiller, Yorick; Devoivre, Thierry; Belledent, Jerome; Foussadier, Franck; Borjon, Amandine; Patterson, Kyle; Lucas, Kevin; Couderc, Christophe; Sundermann, Frank; Urbani, Jean-Christophe; Baron, Stanislas; Rody, Yves; Chapon, Jean-Damien; Arnaud, Franck; Entradas, Jorge

2005-05-01

In the context of 65nm logic technology where gate CD control budget requirements are below 5nm, it is mandatory to properly quantify the impact of the 2D effects on the electrical behavior of the transistor [1,2]. This study uses the following sequence to estimate the impact on transistor performance: 1) A lithographic simulation is performed after OPC (Optical Proximity Correction) of active and poly using a calibrated model at best conditions. Some extrapolation of this model can also be used to assess marginalities due to process window (focus, dose, mask errors, and overlay). In our case study, we mainly checked the poly to active misalignment effects. 2) Electrical behavior of the transistor (Ion, Ioff, Vt) is calculated based on a derivative spice model using the simulated image of the gate as an input. In most of the cases Ion analysis, rather than Vt or leakage, gives sufficient information for patterning optimization. We have demonstrated the benefit of this approach with two different examples: -design rule trade-off : we estimated the impact with and without misalignment of critical rules like poly corner to active distance, active corner to poly distance or minimum space between small transistor and big transistor. -Library standard cell debugging: we applied this methodology to the most critical one hundred transistors of our standard cell libraries and calculate Ion behavior with and without misalignment between active and poly. We compared two scanner illumination modes and two OPC versions based on the behavior of the one hundred transistors. We were able to see the benefits of one illumination, and also the improvement in the OPC maturity.

Application of resist-profile-aware source optimization in 28 nm full chip optical proximity correction

NASA Astrophysics Data System (ADS)

Zhu, Jun; Zhang, David Wei; Kuo, Chinte; Wang, Qing; Wei, Fang; Zhang, Chenming; Chen, Han; He, Daquan; Hsu, Stephen D.

2017-07-01

As technology node shrinks, aggressive design rules for contact and other back end of line (BEOL) layers continue to drive the need for more effective full chip patterning optimization. Resist top loss is one of the major challenges for 28 nm and below technology nodes, which can lead to post-etch hotspots that are difficult to predict and eventually degrade the process window significantly. To tackle this problem, we used an advanced programmable illuminator (FlexRay) and Tachyon SMO (Source Mask Optimization) platform to make resistaware source optimization possible, and it is proved to greatly improve the imaging contrast, enhance focus and exposure latitude, and minimize resist top loss thus improving the yield.

Design intent optimization at the beyond 7nm node: the intersection of DTCO and EUVL stochastic mitigation techniques

NASA Astrophysics Data System (ADS)

Crouse, Michael; Liebmann, Lars; Plachecki, Vince; Salama, Mohamed; Chen, Yulu; Saulnier, Nicole; Dunn, Derren; Matthew, Itty; Hsu, Stephen; Gronlund, Keith; Goodwin, Francis

2017-03-01

The initial readiness of EUV patterning was demonstrated in 2016 with IBM Alliance's 7nm device technology. The focus has now shifted to driving the 'effective' k1 factor and enabling the second generation of EUV patterning. Thus, Design Technology Co-optimization (DTCO) has become a critical part of technology enablement as scaling has become more challenging and the industry pushes the limits of EUV lithography. The working partnership between the design teams and the process development teams typically involves an iterative approach to evaluate the manufacturability of proposed designs, subsequent modifications to those designs and finally a design manual for the technology. While this approach has served the industry well for many generations, the challenges at the Beyond 7nm node require a more efficient approach. In this work, we describe the use of "Design Intent" lithographic layout optimization where we remove the iterative component of DTCO and replace it with an optimization that achieves both a "patterning friendly" design and minimizes the well-known EUV stochastic effects. Solved together, this "design intent" approach can more quickly achieve superior lithographic results while still meeting the original device's functional specifications. Specifically, in this work we will demonstrate "design intent" optimization for critical BEOL layers using design tolerance bands to guide the source mask co-optimization. The design tolerance bands can be either supplied as part of the original design or derived from some basic rules. Additionally, the EUV stochastic behavior is mitigated by enhancing the image log slope (ILS) for specific key features as part of the overall optimization. We will show the benefit of the "design intent approach" on both bidirectional and unidirectional 28nm min pitch standard logic layouts and compare the more typical iterative SMO approach. Thus demonstrating the benefit of allowing the design to float within the specified range. Lastly, we discuss how the evolution of this approach could lead to layout optimization based entirely on some minimal set of functional requirements and process constraints.

Layout pattern analysis using the Voronoi diagram of line segments

NASA Astrophysics Data System (ADS)

Dey, Sandeep Kumar; Cheilaris, Panagiotis; Gabrani, Maria; Papadopoulou, Evanthia

2016-01-01

Early identification of problematic patterns in very large scale integration (VLSI) designs is of great value as the lithographic simulation tools face significant timing challenges. To reduce the processing time, such a tool selects only a fraction of possible patterns which have a probable area of failure, with the risk of missing some problematic patterns. We introduce a fast method to automatically extract patterns based on their structure and context, using the Voronoi diagram of line-segments as derived from the edges of VLSI design shapes. Designers put line segments around the problematic locations in patterns called "gauges," along which the critical distance is measured. The gauge center is the midpoint of a gauge. We first use the Voronoi diagram of VLSI shapes to identify possible problematic locations, represented as gauge centers. Then we use the derived locations to extract windows containing the problematic patterns from the design layout. The problematic locations are prioritized by the shape and proximity information of the design polygons. We perform experiments for pattern selection in a portion of a 22-nm random logic design layout. The design layout had 38,584 design polygons (consisting of 199,946 line segments) on layer Mx, and 7079 markers generated by an optical rule checker (ORC) tool. The optical rules specify requirements for printing circuits with minimum dimension. Markers are the locations of some optical rule violations in the layout. We verify our approach by comparing the coverage of our extracted patterns to the ORC-generated markers. We further derive a similarity measure between patterns and between layouts. The similarity measure helps to identify a set of representative gauges that reduces the number of patterns for analysis.

Numerical study on refractive index sensor based on hybrid-plasmonic mode

NASA Astrophysics Data System (ADS)

Yun, Jeong-Geun; Kim, Joonsoo; Lee, Kyookeun; Lee, Yohan; Lee, Byoungho

2017-04-01

We propose a highly sensitive hybrid-plasmonic sensor based on thin-gold nanoslit arrays. The transmission characteristics of gold nanoslit arrays are analyzed as changing the thickness of gold layer. The surface plasmon polariton mode excited on the sensing medium, which is sensitive to refractive index change of the sensing medium, is strengthened by reducing the thickness of the gold layer. A design rule is suggested that steeper dispersion curve of the surface plasmon polariton mode leads to higher sensitivity. For the dispersion engineering, hybrid-plasmonic structure, which consists of thin-gold nanoslit arrays, sensing region and high refractive index dielectric space is introduced. The proposed sensor structure with period of 700 nm shows the improved sensitivity up to 1080 nm/RIU (refractive index unit), and the surface sensitivity is extremely enhanced.

Simulation-based MDP verification for leading-edge masks

NASA Astrophysics Data System (ADS)

Su, Bo; Syrel, Oleg; Pomerantsev, Michael; Hagiwara, Kazuyuki; Pearman, Ryan; Pang, Leo; Fujimara, Aki

2017-07-01

For IC design starts below the 20nm technology node, the assist features on photomasks shrink well below 60nm and the printed patterns of those features on masks written by VSB eBeam writers start to show a large deviation from the mask designs. Traditional geometry-based fracturing starts to show large errors for those small features. As a result, other mask data preparation (MDP) methods have become available and adopted, such as rule-based Mask Process Correction (MPC), model-based MPC and eventually model-based MDP. The new MDP methods may place shot edges slightly differently from target to compensate for mask process effects, so that the final patterns on a mask are much closer to the design (which can be viewed as the ideal mask), especially for those assist features. Such an alteration generally produces better masks that are closer to the intended mask design. Traditional XOR-based MDP verification cannot detect problems caused by eBeam effects. Much like model-based OPC verification which became a necessity for OPC a decade ago, we see the same trend in MDP today. Simulation-based MDP verification solution requires a GPU-accelerated computational geometry engine with simulation capabilities. To have a meaningful simulation-based mask check, a good mask process model is needed. The TrueModel® system is a field tested physical mask model developed by D2S. The GPU-accelerated D2S Computational Design Platform (CDP) is used to run simulation-based mask check, as well as model-based MDP. In addition to simulation-based checks such as mask EPE or dose margin, geometry-based rules are also available to detect quality issues such as slivers or CD splits. Dose margin related hotspots can also be detected by setting a correct detection threshold. In this paper, we will demonstrate GPU-acceleration for geometry processing, and give examples of mask check results and performance data. GPU-acceleration is necessary to make simulation-based mask MDP verification acceptable.

High-reflectivity high-contrast grating focusing reflector on silicon-on-insulator wafer

NASA Astrophysics Data System (ADS)

Fang, Wenjing; Huang, Yongqing; Duan, Xiaofeng; Liu, Kai; Fei, Jiarui; Ren, Xiaomin

2016-11-01

A high-contrast grating (HCG) focusing reflector providing phase front control of reflected light and high reflectivity is proposed and fabricated. Basic design rules to engineer this category of structures are given in detail. A 1550 nm TM polarized incident light of 11.86 mm in focal length and 0.8320 in reflectivity is obtained in experiment. The wavelength dependence of the fabricated HCGs from 1530 nm to 1580 nm is also tested. The test results show that the focal length is in the range of 11.81-12 mm, which is close to the designed focal length of 15 mm. The reflectivity is almost above 0.56 within a bandwidth of 50 nm. At a distance of 11.86 mm, the light is focused to a round spot with the highest concentration, which is much smaller than the size of the incident beam. The FWHM of the reflected light beam decreases to 120 nm, and the intensity increases to 1.18. Project supported by the National Natural Science Foundation of China (Grant Nos. 61274044, 61574019 and 61020106007), the National Basic Research Program of China (Grant No. 2010CB327600), the Specialized Research Fund for the Doctoral Program of Higher Education of China (Grant No. 20130005130001), the Natural Science Foundation of Beijing, China (Grant No. 4132069), the Key International Science and Technology Cooperation Project of China (Grant No. 2011RR000100), the 111 Project of China (Grant No. B07005), and the Program for Changjiang Scholars and Innovative Research Team in Universities of China (Grant No. IRT0609).

The study on the effect of pattern density distribution on the STI CMP process

NASA Astrophysics Data System (ADS)

Sub, Yoon Myung; Hian, Bernard Yap Tzen; Fong, Lee It; Anak, Philip Menit; Minhar, Ariffin Bin; Wui, Tan Kim; Kim, Melvin Phua Twang; Jin, Looi Hui; Min, Foo Thai

2017-08-01

The effects of pattern density on CMP characteristics were investigated using specially designed wafer for the characterization of pattern-dependencies in STI CMP [1]. The purpose of this study is to investigate the planarization behavior based on a direct STI CMP used in cerium (CeO2) based slurry system in terms of pattern density variation. The minimal design rule (DR) of 180nm generation technology node was adopted for the mask layout. The mask was successfully applied for evaluation of a cerium (CeO2) abrasive based direct STI CMP process. In this study, we described a planarization behavior of the loading-effects of pattern density variation which were characterized with layout pattern density and pitch variations using masks mentioned above. Furthermore, the characterizing pattern dependent on the variations of the dimensions and spacing features, in thickness remaining after CMP, were analyzed and evaluated. The goal was to establish a concept of library method which will be used to generate design rules reducing the probability of CMP-related failures. Details of the characterization were measured in various layouts showing different pattern density ranges and the effects of pattern density on STI CMP has been discussed in this paper.

Development of critical dimension measurement scanning electron microscope for ULSI (S-8000 series)

NASA Astrophysics Data System (ADS)

Ezumi, Makoto; Otaka, Tadashi; Mori, Hiroyoshi; Todokoro, Hideo; Ose, Yoichi

1996-05-01

The semiconductor industry is moving from half-micron to quarter-micron design rules. To support this evolution, Hitachi has developed a new critical dimension measurement scanning electron microscope (CD-SEM), the model S-8800 series, for quality control of quarter- micron process lines. The new CD-SEM provides detailed examination of process conditions with 5 nm resolution and 5 nm repeatability (3 sigma) at accelerating voltage 800 V using secondary electron imaging. In addition, a newly developed load-lock system has a capability of achieving a high sample throughput of 20 wafers/hour (5 point measurements per wafer) under continuous operation. To support user friendliness, the system incorporates a graphical user interface (GUI), an automated pattern recognition system which helps locating measurement points, both manual and semi-automated operation, and user-programmable operating parameters.

Microeconomics of yield learning and process control in semiconductor manufacturing

NASA Astrophysics Data System (ADS)

Monahan, Kevin M.

2003-06-01

Simple microeconomic models that directly link yield learning to profitability in semiconductor manufacturing have been rare or non-existent. In this work, we review such a model and provide links to inspection capability and cost. Using a small number of input parameters, we explain current yield management practices in 200mm factories. The model is then used to extrapolate requirements for 300mm factories, including the impact of technology transitions to 130nm design rules and below. We show that the dramatic increase in value per wafer at the 300mm transition becomes a driver for increasing metrology and inspection capability and sampling. These analyses correlate well wtih actual factory data and often identify millions of dollars in potential cost savings. We demonstrate this using the example of grating-based overlay metrology for the 65nm node.

Range pattern matching with layer operations and continuous refinements

NASA Astrophysics Data System (ADS)

Tseng, I.-Lun; Lee, Zhao Chuan; Li, Yongfu; Perez, Valerio; Tripathi, Vikas; Ong, Jonathan Yoong Seang

2018-03-01

At advanced and mainstream process nodes (e.g., 7nm, 14nm, 22nm, and 55nm process nodes), lithography hotspots can exist in layouts of integrated circuits even if the layouts pass design rule checking (DRC). Existence of lithography hotspots in a layout can cause manufacturability issues, which can result in yield losses of manufactured integrated circuits. In order to detect lithography hotspots existing in physical layouts, pattern matching (PM) algorithms and commercial PM tools have been developed. However, there are still needs to use DRC tools to perform PM operations. In this paper, we propose a PM synthesis methodology, which uses a continuous refinement technique, for the automatic synthesis of a given lithography hotspot pattern into a DRC deck, which consists of layer operation commands, so that an equivalent PM operation can be performed by executing the synthesized deck with the use of a DRC tool. Note that the proposed methodology can deal with not only exact patterns, but also range patterns. Also, lithography hotspot patterns containing multiple layers can be processed. Experimental results show that the proposed methodology can accurately and efficiently detect lithography hotspots in physical layouts.

Toward the 5nm technology: layout optimization and performance benchmark for logic/SRAMs using lateral and vertical GAA FETs

NASA Astrophysics Data System (ADS)

Huynh-Bao, Trong; Ryckaert, Julien; Sakhare, Sushil; Mercha, Abdelkarim; Verkest, Diederik; Thean, Aaron; Wambacq, Piet

2016-03-01

In this paper, we present a layout and performance analysis of logic and SRAM circuits for vertical and lateral GAA FETs using 5nm (iN5) design rules. Extreme ultra-violet lithography (EUVL) processes are exploited to print the critical features: 32 nm gate pitch and 24 nm metal pitch. Layout architectures and patterning compromises for enabling the 5nm node will be discussed in details. A distinct standard-cell template for vertical FETs is proposed and elaborated for the first time. To assess electrical performances, a BSIM-CMG model has been developed and calibrated with TCAD simulations, which accounts for the quasi-ballistic transport in the nanowire channel. The results show that the inbound power rail layout construct for vertical devices could achieve the highest density while the interleaving diffusion template can maximize the port accessibility. By using a representative critical path circuit of a generic low power SoCs, it is shown that the VFET-based circuit is 40% more energy efficient than LFET designs at iso-performance. Regarding SRAMs, benefits given by vertical channel orientation in VFETs has reduced the SRAM area by 20%~30% compared to lateral SRAMs. A double exposures with EUV canner is needed to reach a minimum tip-to-tip (T2T) of 16 nm for middle-of-line (MOL) layers. To enable HD SRAMs with two metal layers, a fully self-aligned gate contact for LFETs and 2D routing of the top electrode for VFETs are required. The standby leakage of vertical SRAMs is 4~6X lower than LFET-based SRAMs at iso-performance and iso-area. The minimum operating voltage (Vmin) of vertical SRAMs is 170 mV lower than lateral SRAMs. A high-density SRAM bitcell of 0.014 um2 can be obtained for the iN5 technology node, which fully follows the SRAM scaling trend for the 45nm nodes and beyond.

Simple method to verify OPC data based on exposure condition

NASA Astrophysics Data System (ADS)

Moon, James; Ahn, Young-Bae; Oh, Sey-Young; Nam, Byung-Ho; Yim, Dong Gyu

2006-03-01

In a world where Sub100nm lithography tool is an everyday household item for device makers, shrinkage of the device is at a rate that no one ever have imagined. With the shrinkage of device at such a high rate, demand placed on Optical Proximity Correction (OPC) is like never before. To meet this demand with respect to shrinkage rate of the device, more aggressive OPC tactic is involved. Aggressive OPC tactics is a must for sub 100nm lithography tech but this tactic eventually results in greater room for OPC error and complexity of the OPC data. Until now, Optical Rule Check (ORC) or Design Rule Check (DRC) was used to verify this complex OPC error. But each of these methods has its pros and cons. ORC verification of OPC data is rather accurate "process" wise but inspection of full chip device requires a lot of money (Computer , software,..) and patience (run time). DRC however has no such disadvantage, but accuracy of the verification is a total downfall "process" wise. In this study, we were able to create a new method for OPC data verification that combines the best of both ORC and DRC verification method. We created a method that inspects the biasing of the OPC data with respect to the illumination condition of the process that's involved. This new method for verification was applied to 80nm tech ISOLATION and GATE layer of the 512M DRAM device and showed accuracy equivalent to ORC inspection with run time that of DRC verification.

Laser beam machining of polycrystalline diamond for cutting tool manufacturing

NASA Astrophysics Data System (ADS)

Wyszyński, Dominik; Ostrowski, Robert; Zwolak, Marek; Bryk, Witold

2017-10-01

The paper concerns application of DPSS Nd: YAG 532nm pulse laser source for machining of polycrystalline WC based diamond inserts (PCD). The goal of the research was to determine optimal laser cutting parameters for cutting tool shaping. Basic criteria to reach the goal was cutting edge quality (minimalization of finishing operations), material removal rate (time and cost efficiency), choice of laser beam characteristics (polarization, power, focused beam diameter). The research was planned and realised and analysed according to design of experiment rules (DOE). The analysis of the cutting edge was prepared with use of Alicona Infinite Focus measurement system.

76 FR 36864 - Special Conditions: Gulfstream Model GVI Airplane; Operation Without Normal Electric Power

Federal Register 2010, 2011, 2012, 2013, 2014

2011-06-23

... DEPARTMENT OF TRANSPORTATION Federal Aviation Administration 14 CFR Part 25 [Docket No. NM444; Special Conditions No. 25-435-SC] Special Conditions: Gulfstream Model GVI Airplane; Operation Without... rules (VFR) conditions for at least five minutes after loss of all normal electrical power. This rule...

76 FR 37287 - Western Pacific Pelagic Fisheries; Prohibiting Longline Fishing Within 30 nm of the Northern...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-06-27

... DEPARTMENT OF COMMERCE National Oceanic and Atmospheric Administration 50 CFR Part 665 [Docket No... and Atmospheric Administration (NOAA), Commerce. ACTION: Final rule. SUMMARY: This final rule... Council for Regulation of the Department of Commerce certified to the Chief Council for Advocacy of the...

Stitching-aware in-design DPT auto fixing for sub-20nm logic devices

NASA Astrophysics Data System (ADS)

Choi, Soo-Han; Sai Krishna, K. V. V. S.; Pemberton-Smith, David

2017-03-01

As the technology continues to shrink below 20nm, Double Patterning Technology (DPT) becomes one of the mandatory solutions for routing metal layers. From the view point of Place and Route (P&R), the major concerns are how to prevent DPT odd-cycles automatically without sacrificing chip area. Even though the leading-edge P&R tools have advanced algorithms to prevent DPT odd-cycles, it is very hard to prevent the localized DPT odd-cycles, especially in Engineering Change Order (ECO) routing. In the last several years, we developed In-design DPT Auto Fixing method in order to reduce localized DPT odd-cycles significantly during ECO and could achieve remarkable design Turn-Around Times (TATs). But subsequently, as the design complexity continued increasing and chip size continued decreasing, we needed a new In-design DPT Auto Fixing approach to improve the auto. fixing rate. In this paper, we present the Stitching-Aware In-design DPT Auto Fixing method for better fixing rates and smaller chip design. The previous In-design DPT Auto Fixing method detected all DPT odd-cycles and tried to remove oddcycles by increasing the adjacent space. As the metal congestions increase in the newer technology nodes, the older Auto Fixing method has limitations to increase the adjacent space between routing metals. Consequently, the auto fixing rate of older method gets worse with the introduction of the smaller design rules. With DPT stitching enablement at In-design DRC checking procedure, the new Stitching-Aware DPT Auto Fixing method detects the most critical odd-cycles and revolve the odd-cycles automatically. The accuracy of new flow ensures better usage of space in the congested areas, and helps design more smaller chips. By applying the Stitching-Aware DPT Auto Fixing method to sub-20nm logic devices, we can confirm that the auto fixing rate is improved by 2X compared with auto fixing without stitching. Additionally, by developing the better heuristic algorithm and flow for DPT stitching, we can get DPT compliant layout with the acceptable design TATs.

Design of compressors for FEL pulses using deformable gratings

NASA Astrophysics Data System (ADS)

Bonora, Stefano; Fabris, Nicola; Frassetto, Fabio; Giovine, Ennio; Miotti, Paolo; Quintavalla, Martino; Poletto, Luca

2017-06-01

We present the optical layout of soft X-rays compressors using reflective grating specifically designed to give both positive or negative group-delay dispersion (GDD). They are tailored for chirped-pulse-amplification experiments with FEL sources. The optical design originates from an existing compressor with plane gratings already realized and tested at FERMI, that has been demonstrated capable to introduce tunable negative GDD. Here, we discuss two novel designs for compressors using deformable gratings capable to give both negative and positive GDD. Two novel designs are discussed: 1) a design with two deformable gratings and an intermediate focus between the twos, that is demonstrated capable to introduce positive GDD; 2) a design with one deformable grating giving an intermediate focus, followed by a concave mirror and a plane grating, that is capable to give both positive and negative GDD depending on the distance between the second mirror and the second grating. Both the designs are tunable in wavelength and GDD, by acting on the deformable gratings, that are rotated to tune the wavelength and the GDD and deformed to introduce the radius required to keep the spectral focus. The deformable gratings have a laminar profile and are ruled on a thin silicon plane substrate. A piezoelectric actuator is glued on the back of the substrate and is actuated to give a radius of curvature that is varying from infinite (plane) to few meters. The ruling procedure, the piezoelectric actuator and the efficiency measurements in the soft X-rays will be presented. Some test cases are discussed for wavelengths shorter than 12 nm.

Nanotechnology for the forest products industry

Treesearch

Theodore Wegner; Philip Jones

2005-01-01

Nanotechnology is defined as the manipulation of materials measuring 100 nanometers or less in at least one dimension. In addition, nanomaterials must display unique properties and characteristics that are different than their bulk properties. At the 1-nanometer (nm) level, quantum mechanics rules, and at dimensions above 100 nm, classical continuum mechanics, physics...

76 FR 8314 - Special Conditions: Gulfstream Model GVI Airplane; Operation Without Normal Electric Power

Federal Register 2010, 2011, 2012, 2013, 2014

2011-02-14

... DEPARTMENT OF TRANSPORTATION Federal Aviation Administration 14 CFR Part 25 [Docket No. NM444 Special Conditions No. 25-11-03-SC] Special Conditions: Gulfstream Model GVI Airplane; Operation Without... Aviation Administration, Transport Airplane Directorate, Attn: Rules Docket (ANM-113), Docket No. NM444...

78 FR 78299 - Proposed Establishment of Class E Airspace; Truth or Consequences, NM

Federal Register 2010, 2011, 2012, 2013, 2014

2013-12-26

...-0995; Airspace Docket No. 13-ASW-30] Proposed Establishment of Class E Airspace; Truth or Consequences... Truth or Consequences VHF Omni-Directional Radio Range Tactical Air Navigation Aid (VORTAC), Truth or Consequences, NM, to facilitate vectoring of Instrument Flight Rules (IFR) aircraft under control of...

Considerations for fine hole patterning for the 7nm node

NASA Astrophysics Data System (ADS)

Yaegashi, Hidetami; Oyama, Kenichi; Hara, Arisa; Natori, Sakurako; Yamauchi, Shohei; Yamato, Masatoshi; Koike, Kyohei

2016-03-01

One of the practical candidates to produce 7nm node logic devices is to use the multiple patterning with 193-immersion exposure. For the multiple patterning, it is important to evaluate the relation between the number of mask layer and the minimum pitch systematically to judge the device manufacturability. Although the number of the time of patterning, namely LE(Litho-Etch) ^ x-time, and overlay steps have to be reduced, there are some challenges in miniaturization of hole size below 20nm. Various process fluctuations on contact hole have a direct impact on device performance. According to the technical trend, 12nm diameter hole on 30nm-pitch hole will be needed on 7nm node. Extreme ultraviolet lithography (EUV) and Directed self-assembly (DSA) are attracting considerable attention to obtain small feature size pattern, however, 193-immersion still has the potential to extend optical lithography cost-effectively for sub-7nm node. The objective of this work is to study the process variation challenges and resolution in post-processing for the CD-bias control to meet sub-20nm diameter contact hole. Another pattern modulation is also demonstrated during post-processing step for hole shrink. With the realization that pattern fidelity and pattern placement management will limit scaling long before devices and interconnects fail to perform intrinsically, the talk will also outline how circle edge roughness (CER) and Local-CD uniformity can correct efficiency. On the other hand, 1D Gridded-Design-Rules layout (1D layout) has simple rectangular shapes. Also, we have demonstrated CD-bias modification on short trench pattern to cut grating line for its fabrication.

Optical reflectance of solution processed quasi-superlattice ZnO and Al-doped ZnO (AZO) channel materials

NASA Astrophysics Data System (ADS)

Buckley, Darragh; McCormack, Robert; O'Dwyer, Colm

2017-04-01

The angle-resolved reflectance of high crystalline quality, c-axis oriented ZnO and AZO single and periodic quasi-superlattice (QSL) spin-coated TFT channels materials are presented. The data is analysed using an adapted model to accurately determine the spectral region for optical thickness and corresponding reflectance. The optical thickness agrees very well with measured thickness of 1-20 layered QSL thin films determined by transmission electron microscopy if the reflectance from lowest interference order is used. Directional reflectance for single layers or homogeneous QSLs of ZnO and AZO channel materials exhibit a consistent degree of anti-reflection characteristics from 30 to 60° (~10-12% reflection) for thickness ranging from ~40 nm to 500 nm. The reflectance of AZO single layer thin films is  <10% from 30 to 75° at 514.5 nm, and  <6% at 632.8 nm from 30-60°. The data show that ZnO and AZO with granular or periodic substructure behave optically as dispersive, continuous thin films of similar thickness, and angle-resolved spectral mapping provides a design rule for transparency or refractive index determination as a function of film thickness, substructure (dispersion) and viewing angle.

Reflow process stabilization by chemical characteristics and process conditions

NASA Astrophysics Data System (ADS)

Kim, Myoung-Soo; Park, Jeong-Hyun; Kim, Hak-Joon; Kim, Il-Hyung; Jeon, Jae-Ha; Gil, Myung-Goon; Kim, Bong-Ho

2002-07-01

With the shrunken device rule below 130nm, the patterning of smaller contact hole with enough process margin is required for mass production. Therefore, shrinking technology using thermal reflow process has been applied for smaller contact hole formation. In this paper, we have investigated the effects of chemical characteristics such as molecular weight, blocking ratio of resin, cross-linker amount and solvent type with its composition to reflow process of resist and found the optimized chemical composition for reflow process applicable condition. And several process conditions like resist coating thickness and multi-step thermal reflow method have been also evaluated to stabilize the pattern profile and improve CD uniformity after reflow process. From the experiment results, it was confirmed that the effect of crosslinker in resist to reflow properties such as reflow temperature and reflow rate were very critical and it controlled the pattern profile during reflow processing. And also, it showed stable CD uniformity and improved resist properties for top loss, film shrinkage and etch selectivity. The application of lower coating thickness of resist induced symmetric pattern profile even at edge with wider process margin. The introduction of two-step baking method for reflow process showed uniform CD value, also. It is believed that the application of resist containing crosslinker and optimized process conditions for smaller contact hole patterning is necessary for the mass production with a design rule below 130nm.

SL2+: H5 use case

NASA Astrophysics Data System (ADS)

Ito, Kosuke; Liu, Steven; Lee, Isaac; Dover, Russell; Yu, Paul

2008-10-01

Photomask contamination inspections, whether performed at maskshops as an outgoing inspection or at wafer fabs for incoming shipping and handling or progressive defect monitoring, have been performed by KLA-Tencor STARlight systems for a number of design nodes. STARlight has evolved since it first appeared on the 3xx generation of KLA-Tencor mask inspection tools. It was improved with the TeraStar (also known as SLF) based tools with the SL1 algorithm. SL2 first appeared on the TeraScan systems (also known as 5xx) and has been widely adopted in both mask shops and wafer fabs. Design rules continue to advance as do inspection challenges. Advances in computer processing power have enabled more complex and powerful algorithms to be developed and applied to the STARlight technology. The current generation of STARlight, which is known as SL2+, implements improved modeling fidelity as well as a completely new paradigm to the existing STARlight technology known as HiRes5, or simply "H5". H5 is integrated seamlessly within SL2+ and provides die-to-die-like performance in both transmitted and reflected light, in addition to the STARlight detection, in unit time. It achieves this by automatically identifying repeating structures in both X and Y directions and applying image alignment and difference threshold. A leading mask shop partnered with KLA-Tencor in order to evaluate SL2+ at its facility. SL2+ demonstrated a high level of sensitivity on all test reticles, with good inspectability on advanced production reticles. High sensitivity settings were used for 45 nm HP and smaller design rule masks and low false detections were achieved. H5 provided additional sensitivity on production plates, demonstrating the ability to extend the use of SL2+ to cover 32 nm DR plate inspections. This paper reports the findings and results of this evaluation.

DfM requirements and ROI analysis for system-on-chip

NASA Astrophysics Data System (ADS)

Balasinski, Artur

2005-11-01

DfM (Design-for-Manufacturability) has become staple requirement beyond 100 nm technology node for efficient generation of mask data, cost reduction, and optimal circuit performance. Layout pattern has to comply to many requirements pertaining to database structure and complexity, suitability for image enhancement by the optical proximity correction, and mask data pattern density and distribution over the image field. These requirements are of particular complexity for Systems-on-Chip (SoC). A number of macro-, meso-, and microscopic effects such as reticle macroloading, planarization dishing, and pattern bridging or breaking would compromise fab yield, device performance, or both. In order to determine the optimal set of DfM rules applicable to the particular designs, Return-on-Investment and Failure Mode and Effect Analysis (FMEA) are proposed.

Unified design of sinusoidal-groove fused-silica grating.

PubMed

Feng, Jijun; Zhou, Changhe; Cao, Hongchao; Lu, Peng

2010-10-20

A general design rule of deep-etched subwavelength sinusoidal-groove fused-silica grating as a highly efficient polarization-independent or polarization-selective device is studied based on the simplified modal method, which shows that the device structure depends little on the incident wavelength, but mainly on the ratio of groove depth to incident wavelength and the ratio of wavelength to grating period. These two ratios could be used as the design guidelines for wavelength-independent structure from deep ultraviolet to far infrared. The optimized grating profile with a different function as a polarizing beam splitter, a polarization-independent two-port beam splitter, or a polarization-independent grating with high efficiency of -1st order is obtained at a wavelength of 1064 nm, and verified by using the rigorous coupled-wave analysis. The performance of the sinusoidal grating is better than a conventional rectangular one, which could be useful for practical applications.

Particle detection for patterned wafers of 100nm design rule by evanescent light illumination: analysis of evanescent light scattering using Finite-Difference Time-Domain (FDTD) method

NASA Astrophysics Data System (ADS)

Yoshioka, Toshie; Miyoshi, Takashi; Takaya, Yasuhiro

2005-12-01

To realize high productivity and reliability of the semiconductor, patterned wafers inspection technology to maintain high yield becomes essential in modern semiconductor manufacturing processes. As circuit feature is scaled below 100nm, the conventional imaging and light scattering methods are impossible to apply to the patterned wafers inspection technique, because of diffraction limit and lower S/N ratio. So, we propose a new particle detection method using annular evanescent light illumination. In this method, a converging annular light used as a light source is incident on a micro-hemispherical lens. When the converging angle is larger than critical angle, annular evanescent light is generated under the bottom surface of the hemispherical lens. Evanescent light is localized near by the bottom surface and decays exponentially away from the bottom surface. So, the evanescent light selectively illuminates the particles on the patterned wafer surface, because it can't illuminate the patterned wafer surface. The proposed method evaluates particles on a patterned wafer surface by detecting scattered evanescent light distribution from particles. To analyze the fundamental characteristics of the proposed method, the computer simulation was performed using FDTD method. The simulation results show that the proposed method is effective for detecting 100nm size particle on patterned wafer of 100nm lines and spaces, particularly under the condition that the evanescent light illumination with p-polarization and parallel incident to the line orientation. Finally, the experiment results suggest that 220nm size particle on patterned wafer of about 200nm lines and spaces can be detected.

Aerial image measurement technique for automated reticle defect disposition (ARDD) in wafer fabs

NASA Astrophysics Data System (ADS)

Zibold, Axel M.; Schmid, Rainer M.; Stegemann, B.; Scheruebl, Thomas; Harnisch, Wolfgang; Kobiyama, Yuji

2004-08-01

The Aerial Image Measurement System (AIMS)* for 193 nm lithography emulation has been brought into operation successfully worldwide. A second generation system comprising 193 nm AIMS capability, mini-environment and SMIF, the AIMS fab 193 plus is currently introduced into the market. By adjustment of numerical aperture (NA), illumination type and partial illumination coherence to match the conditions in 193 nm steppers or scanners, it can emulate the exposure tool for any type of reticles like binary, OPC and PSM down to the 65 nm node. The system allows a rapid prediction of wafer printability of defects or defect repairs, and critical features, like dense patterns or contacts on the masks without the need to perform expensive image qualification consisting of test wafer exposures followed by SEM measurements. Therefore, AIMS is a mask quality verification standard for high-end photo masks and established in mask shops worldwide. The progress on the AIMS technology described in this paper will highlight that besides mask shops there will be a very beneficial use of the AIMS in the wafer fab and we propose an Automated Reticle Defect Disposition (ARDD) process. With smaller nodes, where design rules are 65 nm or less, it is expected that smaller defects on reticles will occur in increasing numbers in the wafer fab. These smaller mask defects will matter more and more and become a serious yield limiting factor. With increasing mask prices and increasing number of defects and severability on reticles it will become cost beneficial to perform defect disposition on the reticles in wafer production. Currently ongoing studies demonstrate AIMS benefits for wafer fab applications. An outlook will be given for extension of 193 nm aerial imaging down to the 45 nm node based on emulation of immersion scanners.

Plasma-Assisted Dry Etching of Ferroelectric Capacitor Modules and Application to a 32M Ferroelectric Random Access Memory Devices with Submicron Feature Sizes

NASA Astrophysics Data System (ADS)

Lee, Sang-Woo; Joo, Suk-Ho; Cho, Sung Lae; Son, Yoon-Ho; Lee, Kyu-Mann; Nam, Sang-Don; Park, Kun-Sang; Lee, Yong-Tak; Seo, Jung-Suk; Kim, Young-Dae; An, Hyeong-Geun; Kim, Hyoung-Joon; Jung, Yong-Ju; Heo, Jang-Eun; Lee, Moon-Sook; Park, Soon-Oh; Chung, U-In; Moon, Joo-Tae

2002-11-01

In the manufacturing of a 32M ferroelectric random access memory (FRAM) device on the basis of 0.25 design rule (D/R), one of the most difficult processes is to pattern a submicron capacitor module while retaining good ferroelectric properties. In this paper, we report the ferroelectric property of patterned submicron capacitor modules with a stack height of 380 nm, where the 100 nm-thick Pb(Zr, Ti)O3 (PZT) films were prepared by the sol-gel method. After patterning, overall sidewall slope was approximately 70° and cell-to-cell node separation was made to be 80 nm to prevent possible twin-bit failure in the device. Finally, several heat treatment conditions were investigated to retain the ferroelectric property of the patterned capacitor. It was found that rapid thermal processing (RTP) treatment yields better properties than conventional furnace annealing. This result is directly related to the near-surface chemistry of the PZT films, as confirmed by X-ray photoelectron spectroscopy (XPS) analysis. The resultant switching polarization value of the submicron capacitor was approximately 30 μC/cm2 measured at 3 V.

Current status of x-ray mask manufacturing at the Microlithographic Mask Development Center

NASA Astrophysics Data System (ADS)

Kimmel, Kurt R.; Hughes, Patrick J.

1996-07-01

The Microlithographic Mask Development Center (MMD) has been the focal point of X-ray mask development efforts in the United States since its inception in 1993. Funded by the Advanced Research Projects Agency (ARPA), and with technical support from the Proximity X-ray Lithography Association (AT&T, IBM, Loral Federal Systems, and Motorola) the MMD has recently made dramatic advances in mask fabrication. Numerous defect-free 64Mb and 256Mb DRAM masks have been made on both boron-doped silicon and silicon carbide substrates. Image-placement error of less than 35nm 3 sigma is achieved with high yield. Image-size (critical dimension) control of 25nm 3 sigma on 250nm nominal images is representative performance. This progress is being made in a manufacturing environment with significant volumes, multiple customers, multiple substrate configurations, and fast turnaround-time (TAT) requirements. The MMD state-of-the-art equipment infrastructure has made much of this progress possible. This year the MMD qualified the EL-4, an IBM-designed-and-built variable-shaped-spot e-beam system. The fundamental performance parameters of this system will be described. Operational techniques of multiple partial exposure writing and product specific emulation (PSE) have been implemented to improve image-placement accuracy with remarkable success. Image-size control was studied in detail with contributory components separated. Defect density was systematically reduced to yield defect-free masks while simultaneously tightening inspection criteria. Information about these and other recent engineering highlights will be reported. An outline of the primary engineering challenges and goals for 1996 and status of progress toward 100 nm design rule capability will also be given.

Rigorous assessment of patterning solution of metal layer in 7 nm technology node

NASA Astrophysics Data System (ADS)

Gao, Weimin; Ciofi, Ivan; Saad, Yves; Matagne, Philippe; Bachmann, Michael; Gillijns, Werner; Lucas, Kevin; Demmerle, Wolfgang; Schmoeller, Thomas

2016-01-01

In a 7 nm node (N7), the logic design requires a critical poly pitch of 42 to 45 nm and a metal 1 (M1) pitch of 28 to 32 nm. Such high-pattern density pushes the 193 immersion lithography solution toward its limit and also brings extremely complex patterning scenarios. The N7 M1 layer may require a self-aligned quadruple patterning (SAQP) with a triple litho-etch (LE3) block process. Therefore, the whole patterning process flow requires multiple exposure+etch+deposition processes and each step introduces a particular impact on the pattern profiles and the topography. In this study, we have successfully integrated a simulation tool that enables emulation of the whole patterning flow with realistic process-dependent three-dimensional (3-D) profile and topology. We use this tool to study the patterning process variations of the N7 M1 layer including the overlay control, the critical dimension uniformity budget, and the lithographic process window (PW). The resulting 3-D pattern structure can be used to optimize the process flow, verify design rules, extract parasitics, and most importantly, simulate the electric field, and identify hot spots for dielectric reliability. As an example application, the maximum electric field at M1 tip-to-tip, which is one of the most critical patterning locations, has been simulated and extracted. The approach helps to investigate the impact of process variations on dielectric reliability. We have also assessed the alternative M1 patterning flow with a single exposure block using extreme ultraviolet lithography (EUVL) and analyzed its advantages compared to the LE3 block approach.

High-speed receiver based on waveguide germanium photodetector wire-bonded to 90nm SOI CMOS amplifier.

PubMed

Pan, Huapu; Assefa, Solomon; Green, William M J; Kuchta, Daniel M; Schow, Clint L; Rylyakov, Alexander V; Lee, Benjamin G; Baks, Christian W; Shank, Steven M; Vlasov, Yurii A

2012-07-30

The performance of a receiver based on a CMOS amplifier circuit designed with 90nm ground rules wire-bonded to a waveguide germanium photodetector is characterized at data rates up to 40Gbps. Both chips were fabricated through the IBM Silicon CMOS Integrated Nanophotonics process on specialty photonics-enabled SOI wafers. At the data rate of 28Gbps which is relevant to the new generation of optical interconnects, a sensitivity of -7.3dBm average optical power is demonstrated with 3.4pJ/bit power-efficiency and 0.6UI horizontal eye opening at a bit-error-rate of 10(-12). The receiver operates error-free (bit-error-rate < 10(-12)) up to 40Gbps with optimized power supply settings demonstrating an energy efficiency of 1.4pJ/bit and 4pJ/bit at data rates of 32Gbps and 40Gbps, respectively, with an average optical power of -0.8dBm.

Ge-cap quantum-well bulk FinFET for 5 nm node CMOS integration

NASA Astrophysics Data System (ADS)

Dwi Kurniawan, Erry; Peng, Kang-Hui; Yang, Shang-Yi; Yang, Yi-Yun; Thirunavukkarasu, Vasanthan; Lin, Yu-Hsien; Wu, Yung-Chun

2018-04-01

We propose the use of Ge-cap quantum-well (QW) bulk FinFET for 5 nm CMOS integration, which is a Si channel wrapped with Ge around three sides of the fin channel. The simulation results show that the Ge-cap FinFET structure demonstrates better performance than pure Si, pure Ge, and Si-cap FinFET structures. By optimizing Si fin width and Ge-cap thickness, the on-state current of nFET and pFET can also be symmetric without changing the total fin width (F Wp = F Wn). The electrons in Ge-cap nFinFET concentrate in the Si channel because of QWs formed in the lowest conduction band of the Ge and Si heterostructure, while the holes in Ge-cap pFinFET prefer to stay in Ge surfaces owing to QWs formed in the Ge valence band. The physics studies of this device have made the design rules relevant for the application of the CMOS inverter and static random access memory (SRAM) application technology.

Microeconomics of process control in semiconductor manufacturing

NASA Astrophysics Data System (ADS)

Monahan, Kevin M.

2003-06-01

Process window control enables accelerated design-rule shrinks for both logic and memory manufacturers, but simple microeconomic models that directly link the effects of process window control to maximum profitability are rare. In this work, we derive these links using a simplified model for the maximum rate of profit generated by the semiconductor manufacturing process. We show that the ability of process window control to achieve these economic objectives may be limited by variability in the larger manufacturing context, including measurement delays and process variation at the lot, wafer, x-wafer, x-field, and x-chip levels. We conclude that x-wafer and x-field CD control strategies will be critical enablers of density, performance and optimum profitability at the 90 and 65nm technology nodes. These analyses correlate well with actual factory data and often identify millions of dollars in potential incremental revenue and cost savings. As an example, we show that a scatterometry-based CD Process Window Monitor is an economically justified, enabling technology for the 65nm node.

Integrated layout based Monte-Carlo simulation for design arc optimization

NASA Astrophysics Data System (ADS)

Shao, Dongbing; Clevenger, Larry; Zhuang, Lei; Liebmann, Lars; Wong, Robert; Culp, James

2016-03-01

Design rules are created considering a wafer fail mechanism with the relevant design levels under various design cases, and the values are set to cover the worst scenario. Because of the simplification and generalization, design rule hinders, rather than helps, dense device scaling. As an example, SRAM designs always need extensive ground rule waivers. Furthermore, dense design also often involves "design arc", a collection of design rules, the sum of which equals critical pitch defined by technology. In design arc, a single rule change can lead to chain reaction of other rule violations. In this talk we present a methodology using Layout Based Monte-Carlo Simulation (LBMCS) with integrated multiple ground rule checks. We apply this methodology on SRAM word line contact, and the result is a layout that has balanced wafer fail risks based on Process Assumptions (PAs). This work was performed at the IBM Microelectronics Div, Semiconductor Research and Development Center, Hopewell Junction, NY 12533

Qualification of local advanced cryogenic cleaning technology for 14nm photomask fabrication

NASA Astrophysics Data System (ADS)

Taumer, Ralf; Krome, Thorsten; Bowers, Chuck; Varghese, Ivin; Hopkins, Tyler; White, Roy; Brunner, Martin; Yi, Daniel

2014-10-01

The march toward tighter design rules, and thus smaller defects, implies stronger surface adhesion between defects and the photomask surface compared to past generations, thereby resulting in increased difficulty in photomask cleaning. Current state-of-the-art wet clean technologies utilize functional water and various energies in an attempt to produce similar yield to the acid cleans of previous generations, but without some of the negative side effects. Still, wet cleans have continued to be plagued with issues such as persistent particles and contaminations, SRAF and feature damages, leaving contaminants behind that accelerate photo-induced defect growth, and others. This paper details work done through a design of experiments (DOE) utilized to qualify an improved cryogenic cleaning technology for production in the Advanced Mask Technology Center (AMTC) advanced production lines for 20 and 14 nm processing. All work was conducted at the AMTC facility in Dresden, Germany utilizing technology developed by Eco-Snow Systems and RAVE LLC for their cryogenic local cleaning VC1200F platform. This system uses a newly designed nozzle, improved gaseous CO2 delivery, extensive filtration to remove hydrocarbons and minimize particle adders, and other process improvements to overcome the limitations of the previous generation local cleaning tool. AMTC has successfully qualified this cryogenic cleaning technology and is currently using it regularly to enhance production yields even at the most challenging technology nodes.

Layout optimization with assist features placement by model based rule tables for 2x node random contact

NASA Astrophysics Data System (ADS)

Jun, Jinhyuck; Park, Minwoo; Park, Chanha; Yang, Hyunjo; Yim, Donggyu; Do, Munhoe; Lee, Dongchan; Kim, Taehoon; Choi, Junghoe; Luk-Pat, Gerard; Miloslavsky, Alex

2015-03-01

As the industry pushes to ever more complex illumination schemes to increase resolution for next generation memory and logic circuits, sub-resolution assist feature (SRAF) placement requirements become increasingly severe. Therefore device manufacturers are evaluating improvements in SRAF placement algorithms which do not sacrifice main feature (MF) patterning capability. There are known-well several methods to generate SRAF such as Rule based Assist Features (RBAF), Model Based Assist Features (MBAF) and Hybrid Assisted Features combining features of the different algorithms using both RBAF and MBAF. Rule Based Assist Features (RBAF) continue to be deployed, even with the availability of Model Based Assist Features (MBAF) and Inverse Lithography Technology (ILT). Certainly for the 3x nm node, and even at the 2x nm nodes and lower, RBAF is used because it demands less run time and provides better consistency. Since RBAF is needed now and in the future, what is also needed is a faster method to create the AF rule tables. The current method typically involves making masks and printing wafers that contain several experiments, varying the main feature configurations, AF configurations, dose conditions, and defocus conditions - this is a time consuming and expensive process. In addition, as the technology node shrinks, wafer process changes and source shape redesigns occur more frequently, escalating the cost of rule table creation. Furthermore, as the demand on process margin escalates, there is a greater need for multiple rule tables: each tailored to a specific set of main-feature configurations. Model Assisted Rule Tables(MART) creates a set of test patterns, and evaluates the simulated CD at nominal conditions, defocused conditions and off-dose conditions. It also uses lithographic simulation to evaluate the likelihood of AF printing. It then analyzes the simulation data to automatically create AF rule tables. It means that analysis results display the cost of different AF configurations as the space grows between a pair of main features. In summary, model based rule tables method is able to make it much easier to create rule tables, leading to faster rule-table creation and a lower barrier to the creation of more rule tables.

Spin and orbital magnetic moments of Fe and Co in Co/Fe and Fe/Co multilayers on Si from L2,3 edge X-ray Magnetic Circular Dichroism Spectroscopy

NASA Astrophysics Data System (ADS)

Vemuru, Krishnamurthy; Rosenberg, Richard; Mankey, Gary

Nanostructured FeCo thin films are interesting for magnetic recording applications due to their high saturation magnetization, high Curie temperature and low magnetocrystalline anisotropy. It is desirable to know how the magnetism is modified by the nanostructrure. We report Fe L 2 , 3 edge and Co L2 , 3 edge x-ray magnetic circular dichroism (XMCD) investigations of element specific spin and orbital magnetism of Fe and Co in two multilayer samples: (S1) Si/SiO2/[Co 0.8 nm/Fe 1.6 nm]x32/W (2nm) and (S2) Si/SiO2/[Co 1.6 nm/Fe 0.8 nm]x32/W (2nm) thin films at room temperature. Sum rule analysis of XMCD at Fe L2 , 3 edge in sample S1 shows that the orbital moment of Fe is strongly enhanced and the spin moment is strongly reduced as compared to the values found in bulk Fe. Details of sum rule analysis will be presented to compare and contrast spin magnetic moments and orbital magnetic moments of Fe and Co in the two multilayer samples. This research used resources of the Advanced Photon Source, a U.S. Department of Energy (DOE) Office of Science User Facility operated for the DOE Office of Science by Argonne National Laboratory under Contract No. DE-AC02-06CH11357.

Determination of Pesticides by Gas Chromatography Combined with Mass Spectrometry Using Femtosecond Lasers Emitting at 267, 400, and 800 nm as the Ionization Source.

PubMed

Yang, Xixiang; Imasaka, Tomoko; Imasaka, Totaro

2018-04-03

A standard sample mixture containing 51 pesticides was separated by gas chromatography (GC), and the constituents were identified by mass spectrometry (MS) using femtosecond lasers emitting at 267, 400, and 800 nm as the ionization source. A two-dimensional display of the GC/MS was successfully used for the determination of these compounds. A molecular ion was observed for 38 of the compounds at 267 nm and for 30 of the compounds at 800 nm, in contrast to 27 among 50 compounds when electron ionization was used. These results suggest that the ultraviolet laser is superior to the near-infrared laser for molecular weight determinations and for a more reliable analysis of these compounds. In order to study the conditions for optimal ionization, the experimental data were examined using the spectral properties (i.e., the excitation and ionization energies and absorption spectra for the neutral and ionized species) obtained by quantum chemical calculations. A few molecules remained unexplained by the currently reported rules, requiring additional rules for developing a full understanding of the femtosecond ionization process. The pesticides in the homogenized matrix obtained from kabosu ( citrus sphaerocarpa) were measured using lasers emitting at 267 and 800 nm. The pesticides were clearly separated and measured on the two-dimensional display, especially for the data measured at 267 nm, suggesting that this technique would have potential for use in the practical trace analysis of the pesticides in the environment.

Development of new resist materials for 193-nm dry and immersion lithography

NASA Astrophysics Data System (ADS)

Sasaki, Takashi; Shirota, Naoko; Takebe, Yoko; Yokokoji, Osamu

2006-03-01

We earlier developed new monocyclic fluoropolymers (FUGU) for F II resist materials. But, it is necessary for FUGU to improve of their characteristics, especially the dry-etching resistance, in order to apply for ArF lithography at fine design rules. We have tried to combine FUGUs with Adamntyl methacrylates based conventional ArF resist polymer. In this paper, we have investigated the role of cyclic fluorinated unit, FUGU, in 193 nm resist polymers by analyzing the dissolution behavior. We found that FGEAM showed high sensitivity and good dissolution contrast, compared with acrylate based conventional samples at low PEB temperature (100 °C). And this difference of sensitivity was clearly found when weak acidity PAGs were used. From the dissolution behaviors of FGEAM, FUGU unit can work to improve the resist sensitivity in acrylate based ArF resist polymers. And we also found that FGEAM showed long acid diffusion length on PEB process, compared with Conventional samples. These result show that FUGU unit has a unique characteristics of the sensitivity with 193nm exposure and the acid diffusion behavior. We also investigated a new series of fluorinated copolymers for 193-nm lithography, combination of FUGU monomer and acrylate units which are used in conventional ArF resist. Six ter-polymers of FUGU, combination of FUGU monomers and EAdMA, GBLMA and HAdMA were prepared. We found that FUGU ter-polymers had a good dry etching resistance keeping high transparency at 193nm. And FUGU ter-polymers showed high sensitivity toward 193nm exposure. FUGU ter-polymers also had a high hydrophobic properties compared conventional type ArF resist polymers. So we also expect FUGU ter-polymers to be useful for ArF dry and immersion lithography.

User Guide for Unmanned Aerial System (UAS) Operations on the National Ranges

DTIC Science & Technology

2007-11-01

WARFARE CENTER WEAPONS DIVISION, PT. MUGU NAVAL AIR WARFARE CENTER WEAPONS DIVISION, CHINA LAKE NAVAL AIR WARFARE CENTER AIRCRAFT DIVISION, PATUXENT...with IFR Instrument Flight Rules MRTFB Major Range and Test Facility Base NAS National Airspace System NM nautical mile NTIA National...sectional charts, Instrument Flight Rules ( IFR ) enroute charts, and terminal area charts. The floor and ceiling, operating hours, and controlling

Adjusting resonant wavelengths and spectral shapes of ring resonators using a cladding SiN layer or KOH solution.

PubMed

Park, Sahnggi; Kim, Kap-Joong; Lee, Jong-Moo; Kim, In-Gyoo; Kim, Gyungock

2009-07-06

It is shown that the resonant frequencies and the transmission spectra of ring resonators can be adjusted by depositing or etching the cladding nitride layer on the ring waveguide without introducing an extra loss or extra variations of channel spacing. The cladding nitride layer increases the minimum width of the gap in the coupling region to larger than 150nm which makes it possible to consider photolithography instead of E-beam lithography for the typical design rule of ring filters. KOH silicon etching can also adjust not only the resonance frequencies but also coupling coefficients with a small sacrifice of guiding loss.

System on a Chip (SoC) Overview

NASA Technical Reports Server (NTRS)

LaBel, Kenneth A.

2010-01-01

System-on-a-chip or system on chip (SoC or SOC) refers to integrating all components of a computer or other electronic system into a single integrated circuit (chip). It may contain digital, analog, mixed-signal, and often radio-frequency functions all on a single chip substrate. Complexity drives it all: Radiation tolerance and testability are challenges for fault isolation, propagation, and validation. Bigger single silicon die than flown before and technology is scaling below 90nm (new qual methods). Packages have changed and are bigger and more difficult to inspect, test, and understand. Add in embedded passives. Material interfaces are more complex (underfills, processing). New rules for board layouts. Mechanical and thermal designs, etc.

Towards Optimal Design of Cancer Nanomedicines: Multi-stage Nanoparticles for the Treatment of Solid Tumors.

PubMed

Stylianopoulos, Triantafyllos; Economides, Eva-Athena; Baish, James W; Fukumura, Dai; Jain, Rakesh K

2015-09-01

Conventional drug delivery systems for solid tumors are composed of a nano-carrier that releases its therapeutic load. These two-stage nanoparticles utilize the enhanced permeability and retention (EPR) effect to enable preferential delivery to tumor tissue. However, the size-dependency of the EPR, the limited penetration of nanoparticles into the tumor as well as the rapid binding of the particles or the released cytotoxic agents to cancer cells and stromal components inhibit the uniform distribution of the drug and the efficacy of the treatment. Here, we employ mathematical modeling to study the effect of particle size, drug release rate and binding affinity on the distribution and efficacy of nanoparticles to derive optimal design rules. Furthermore, we introduce a new multi-stage delivery system. The system consists of a 20-nm primary nanoparticle, which releases 5-nm secondary particles, which in turn release the chemotherapeutic drug. We found that tuning the drug release kinetics and binding affinities leads to improved delivery of the drug. Our results also indicate that multi-stage nanoparticles are superior over two-stage nano-carriers provided they have a faster drug release rate and for high binding affinity drugs. Furthermore, our results suggest that smaller nanoparticles achieve better treatment outcome.

Ultimate intra-wafer critical dimension uniformity control by using lithography and etch tool corrections

NASA Astrophysics Data System (ADS)

Kubis, Michael; Wise, Rich; Reijnen, Liesbeth; Viatkina, Katja; Jaenen, Patrick; Luca, Melisa; Mernier, Guillaume; Chahine, Charlotte; Hellin, David; Kam, Benjamin; Sobieski, Daniel; Vertommen, Johan; Mulkens, Jan; Dusa, Mircea; Dixit, Girish; Shamma, Nader; Leray, Philippe

2016-03-01

With shrinking design rules, the overall patterning requirements are getting aggressively tighter. For the 7-nm node and below, allowable CD uniformity variations are entering the Angstrom region (ref [1]). Optimizing inter- and intra-field CD uniformity of the final pattern requires a holistic tuning of all process steps. In previous work, CD control with either litho cluster or etch tool corrections has been discussed. Today, we present a holistic CD control approach, combining the correction capability of the etch tool with the correction capability of the exposure tool. The study is done on 10-nm logic node wafers, processed with a test vehicle stack patterning sequence. We include wafer-to-wafer and lot-to-lot variation and apply optical scatterometry to characterize the fingerprints. Making use of all available correction capabilities (lithography and etch), we investigated single application of exposure tool corrections and of etch tool corrections as well as combinations of both to reach the lowest CD uniformity. Results of the final pattern uniformity based on single and combined corrections are shown. We conclude on the application of this holistic lithography and etch optimization to 7nm High-Volume manufacturing, paving the way to ultimate within-wafer CD uniformity control.

14 CFR Appendix C to Part 91 - Operations in the North Atlantic (NAT) Minimum Navigation Performance Specifications (MNPS) Airspace

Code of Federal Regulations, 2014 CFR

2014-01-01

... OPERATING RULES GENERAL OPERATING AND FLIGHT RULES Pt. 91, App. C Appendix C to Part 91—Operations in the... Oceanic Control Area, excluding the areas west of 60 degrees west and south of 38 degrees 30 minutes north... shall be less than 6.3 NM (11.7 Km). Standard deviation is a statistical measure of data about a mean...

14 CFR Appendix C to Part 91 - Operations in the North Atlantic (NAT) Minimum Navigation Performance Specifications (MNPS) Airspace

Code of Federal Regulations, 2013 CFR

2013-01-01

... OPERATING RULES GENERAL OPERATING AND FLIGHT RULES Pt. 91, App. C Appendix C to Part 91—Operations in the... Oceanic Control Area, excluding the areas west of 60 degrees west and south of 38 degrees 30 minutes north... shall be less than 6.3 NM (11.7 Km). Standard deviation is a statistical measure of data about a mean...

14 CFR Appendix C to Part 91 - Operations in the North Atlantic (NAT) Minimum Navigation Performance Specifications (MNPS) Airspace

Code of Federal Regulations, 2011 CFR

2011-01-01

... OPERATING RULES GENERAL OPERATING AND FLIGHT RULES Pt. 91, App. C Appendix C to Part 91—Operations in the... Oceanic Control Area, excluding the areas west of 60 degrees west and south of 38 degrees 30 minutes north... shall be less than 6.3 NM (11.7 Km). Standard deviation is a statistical measure of data about a mean...

14 CFR Appendix C to Part 91 - Operations in the North Atlantic (NAT) Minimum Navigation Performance Specifications (MNPS) Airspace

Code of Federal Regulations, 2012 CFR

2012-01-01

... OPERATING RULES GENERAL OPERATING AND FLIGHT RULES Pt. 91, App. C Appendix C to Part 91—Operations in the... Oceanic Control Area, excluding the areas west of 60 degrees west and south of 38 degrees 30 minutes north... shall be less than 6.3 NM (11.7 Km). Standard deviation is a statistical measure of data about a mean...

High brightness electrodeless Z-Pinch EUV source for mask inspection tools

NASA Astrophysics Data System (ADS)

Horne, Stephen F.; Partlow, Matthew J.; Gustafson, Deborah S.; Besen, Matthew M.; Smith, Donald K.; Blackborow, Paul A.

2012-03-01

Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinchTM light source since 1995. The source is currently being used for metrology, mask inspection, and resist development. Energetiq's higher brightness source has been selected as the source for pre-production actinic mask inspection tools. This improved source enables the mask inspection tool suppliers to build prototype tools with capabilities of defect detection and review down to 16nm design rules. In this presentation we will present new source technology being developed at Energetiq to address the critical source brightness issue. The new technology will be shown to be capable of delivering brightness levels sufficient to meet the HVM requirements of AIMS and ABI and potentially API tools. The basis of the source technology is to use the stable pinch of the electrodeless light source and have a brightness of up to 100W/mm(carat)2-sr. We will explain the source design concepts, discuss the expected performance and present the modeling results for the new design.

Bayesian design of decision rules for failure detection

NASA Technical Reports Server (NTRS)

Chow, E. Y.; Willsky, A. S.

1984-01-01

The formulation of the decision making process of a failure detection algorithm as a Bayes sequential decision problem provides a simple conceptualization of the decision rule design problem. As the optimal Bayes rule is not computable, a methodology that is based on the Bayesian approach and aimed at a reduced computational requirement is developed for designing suboptimal rules. A numerical algorithm is constructed to facilitate the design and performance evaluation of these suboptimal rules. The result of applying this design methodology to an example shows that this approach is potentially a useful one.

Ultraviolet Communication for Medical Applications

DTIC Science & Technology

2012-06-01

battlefield casualty care. UVC Plasma-shells were fabricated and tested as optical emitter components in the solar blind 200-280 nm UVC region, and were... solar -blind (SB) UVC region (200–280 nm). IST’s proprietary UVC-emitting Plasma-shells are successfully demonstrated in a breadboard system. At this...enclosure and removable filter. Single-crystal solar blind filters provide exceptional rejection but are extremely expensive, ruling out the Ofil filters SB

Technology-design-manufacturing co-optimization for advanced mobile SoCs

NASA Astrophysics Data System (ADS)

Yang, Da; Gan, Chock; Chidambaram, P. R.; Nallapadi, Giri; Zhu, John; Song, S. C.; Xu, Jeff; Yeap, Geoffrey

2014-03-01

How to maintain the Moore's Law scaling beyond the 193 immersion resolution limit is the key question semiconductor industry needs to answer in the near future. Process complexity will undoubtfully increase for 14nm node and beyond, which brings both challenges and opportunities for technology development. A vertically integrated design-technologymanufacturing co-optimization flow is desired to better address the complicated issues new process changes bring. In recent years smart mobile wireless devices have been the fastest growing consumer electronics market. Advanced mobile devices such as smartphones are complex systems with the overriding objective of providing the best userexperience value by harnessing all the technology innovations. Most critical system drivers are better system performance/power efficiency, cost effectiveness, and smaller form factors, which, in turns, drive the need of system design and solution with More-than-Moore innovations. Mobile system-on-chips (SoCs) has become the leading driver for semiconductor technology definition and manufacturing. Here we highlight how the co-optimization strategy influenced architecture, device/circuit, process technology and package, in the face of growing process cost/complexity and variability as well as design rule restrictions.

Quantifying electrical impacts on redundant wire insertion in 7nm unidirectional designs

NASA Astrophysics Data System (ADS)

Mohyeldin, Ahmed; Schroeder, Uwe Paul; Srinivasan, Ramya; Narisetty, Haritez; Malik, Shobhit; Madhavan, Sriram

2017-04-01

In nano-meter scale Integrated Circuits, via fails due to random defects is a well-known yield detractor, and via redundancy insertion is a common method to help enhance semiconductors yield. For the case of Self Aligned Double Patterning (SADP), which might require unidirectional design layers as in the case of some advanced technology nodes, the conventional methods of inserting redundant vias don't work any longer. This is because adding redundant vias conventionally requires adding metal shapes in the non-preferred direction, which will violate the SADP design constraints in that case. Therefore, such metal layers fabricated using unidirectional SADP require an alternative method for providing the needed redundancy. This paper proposes a post-layout Design for Manufacturability (DFM) redundancy insertion method tailored for the design requirements introduced by unidirectional metal layers. The proposed method adds redundant wires in the preferred direction - after searching for nearby vacant routing tracks - in order to provide redundant paths for electrical signals. This method opportunistically adds robustness against failures due to silicon defects without impacting area or incurring new design rule violations. Implementation details of this redundancy insertion method will be explained in this paper. One known challenge with similar DFM layout fixing methods is the possible introduction of undesired electrical impact, causing other unintentional failures in design functionality. In this paper, a study is presented to quantify the electrical impacts of such redundancy insertion scheme and to examine if that electrical impact can be tolerated. The paper will show results to evaluate DFM insertion rates and corresponding electrical impact for a given design utilization and maximum inserted wire length. Parasitic extraction and static timing analysis results will be presented. A typical digital design implemented using GLOBALFOUNDRIES 7nm technology is used for demonstration. The provided results can help evaluate such extensive DFM insertion method from an electrical standpoint. Furthermore, the results could provide guidance on how to implement the proposed method of adding electrical redundancy such that intolerable electrical impacts could be avoided.

Double patterning from design enablement to verification

NASA Astrophysics Data System (ADS)

Abercrombie, David; Lacour, Pat; El-Sewefy, Omar; Volkov, Alex; Levine, Evgueni; Arb, Kellen; Reid, Chris; Li, Qiao; Ghosh, Pradiptya

2011-11-01

Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers. We discuss the unique design and process characteristics of LELE DP, the challenges they present, and various solutions. ∘ We examine DP design methodologies, current DP conflict feedback mechanisms, and how they can help designers identify and resolve conflicts. ∘ In place and route (P&R), the placement engine must now be aware of the assumptions made during IP cell design, and use placement directives provide by the library designer. We examine the new effects DP introduces in detail routing, discuss how multiple choices of LELE and the cut allowances can lead to different solutions, and describe new capabilities required by detail routers and P&R engines. ∘ We discuss why LELE DP cuts and overlaps are critical to optical process correction (OPC), and how a hybrid mechanism of rule and model-based overlap generation can provide a fast and effective solution. ∘ With two litho-etch steps, mask misalignment and image rounding are now verification considerations. We present enhancements to the OPCVerify engine that check for pinching and bridging in the presence of DP overlay errors and acute angles.

Investigation of model-based physical design restrictions (Invited Paper)

NASA Astrophysics Data System (ADS)

Lucas, Kevin; Baron, Stanislas; Belledent, Jerome; Boone, Robert; Borjon, Amandine; Couderc, Christophe; Patterson, Kyle; Riviere-Cazaux, Lionel; Rody, Yves; Sundermann, Frank; Toublan, Olivier; Trouiller, Yorick; Urbani, Jean-Christophe; Wimmer, Karl

2005-05-01

As lithography and other patterning processes become more complex and more non-linear with each generation, the task of physical design rules necessarily increases in complexity also. The goal of the physical design rules is to define the boundary between the physical layout structures which will yield well from those which will not. This is essentially a rule-based pre-silicon guarantee of layout correctness. However the rapid increase in design rule requirement complexity has created logistical problems for both the design and process functions. Therefore, similar to the semiconductor industry's transition from rule-based to model-based optical proximity correction (OPC) due to increased patterning complexity, opportunities for improving physical design restrictions by implementing model-based physical design methods are evident. In this paper we analyze the possible need and applications for model-based physical design restrictions (MBPDR). We first analyze the traditional design rule evolution, development and usage methodologies for semiconductor manufacturers. Next we discuss examples of specific design rule challenges requiring new solution methods in the patterning regime of low K1 lithography and highly complex RET. We then evaluate possible working strategies for MBPDR in the process development and product design flows, including examples of recent model-based pre-silicon verification techniques. Finally we summarize with a proposed flow and key considerations for MBPDR implementation.

Using pattern enumeration to accelerate process development and ramp yield

NASA Astrophysics Data System (ADS)

Zhuang, Linda; Pang, Jenny; Xu, Jessy; Tsai, Mengfeng; Wang, Amy; Zhang, Yifan; Sweis, Jason; Lai, Ya-Chieh; Ding, Hua

2016-03-01

During a new technology node process setup phase, foundries do not initially have enough product chip designs to conduct exhaustive process development. Different operational teams use manually designed simple test keys to set up their process flows and recipes. When the very first version of the design rule manual (DRM) is ready, foundries enter the process development phase where new experiment design data is manually created based on these design rules. However, these IP/test keys contain very uniform or simple design structures. This kind of design normally does not contain critical design structures or process unfriendly design patterns that pass design rule checks but are found to be less manufacturable. It is desired to have a method to generate exhaustive test patterns allowed by design rules at development stage to verify the gap of design rule and process. This paper presents a novel method of how to generate test key patterns which contain known problematic patterns as well as any constructs which designers could possibly draw based on current design rules. The enumerated test key patterns will contain the most critical design structures which are allowed by any particular design rule. A layout profiling method is used to do design chip analysis in order to find potential weak points on new incoming products so fab can take preemptive action to avoid yield loss. It can be achieved by comparing different products and leveraging the knowledge learned from previous manufactured chips to find possible yield detractors.

How thin barrier metal can be used to prevent Co diffusion in the modern integrated circuits?

NASA Astrophysics Data System (ADS)

Dixit, Hemant; Konar, Aniruddha; Pandey, Rajan; Ethirajan, Tamilmani

2017-11-01

In modern integrated circuits (ICs), billions of transistors are connected to each other via thin metal layers (e.g. copper, cobalt, etc) known as interconnects. At elevated process temperatures, inter-diffusion of atomic species can occur among these metal layers, causing sub-optimal performance of interconnects, which may lead to the failure of an IC. Thus, typically a thin barrier metal layer is used to prevent the inter-diffusion of atomic species within interconnects. For ICs with sub-10 nm transistors (10 nm technology node), the design rule (thickness scaling) demands the thinnest possible barrier layer. Therefore, here we investigate the critical thickness of a titanium-nitride (TiN) barrier that can prevent the cobalt diffusion using multi-scale modeling and simulations. First, we compute the Co diffusion barrier in crystalline and amorphous TiN with the nudged elastic band method within first-principles density functional theory simulations. Later, using the calculated activation energy barriers, we quantify the Co diffusion length in the TiN metal layer with the help of kinetic Monte Carlo simulations. Such a multi-scale modelling approach yields an exact critical thickness of the metal layer sufficient to prevent the Co diffusion in IC interconnects. We obtain a diffusion length of a maximum of 2 nm for a typical process of thermal annealing at 400 °C for 30 min. Our study thus provides useful physical insights for the Co diffusion in the TiN layer and further quantifies the critical thickness (~2 nm) to which the metal barrier layer can be thinned down for sub-10 nm ICs.

Short optical pulse generation at 40 GHz with a bulk electro-absorption modulator packaged device

NASA Astrophysics Data System (ADS)

Langlois, Patrick; Moore, Ronald; Prosyk, Kelvin; O'Keefe, Sean; Oosterom, Jill A.; Betty, Ian; Foster, Robert; Greenspan, Jonathan; Singh, Priti

2003-12-01

Short optical pulse generation at 40GHz and 1540nm wavelength is achieved using fully packaged bulk quaternary electro-absorption modulator modules. Experimental results obtained with broadband and narrowband optimized packaged modules are presented and compared against empirical model predictions. Pulse duty cycle, extinction ratio and chirp are studied as a function of sinusoidal drive voltage and detuning between operating wavelength and modulator absorption band edge. Design rules and performance trade-offs are discussed. Low-chirp pulses with a FWHM of ~12ps and sub-4ps at a rate of 40GHz are demonstrated. Optical time-domain demultiplexing of a 40GHz to a 10GHz pulse train is also demonstrated with better than 20dB extinction ratio.

The verification of printability about marginal defects and the detectability at the inspection tool in sub 50nm node

NASA Astrophysics Data System (ADS)

Lee, Hyemi; Jeong, Goomin; Seo, Kangjun; Kim, Sangchul; kim, changreol

2008-05-01

Since mask design rule is smaller and smaller, Defects become one of the issues dropping the mask yield. Furthermore controlled defect size become smaller while masks are manufactured. According to ITRS roadmap on 2007, controlled defect size is 46nm in 57nm node and 36nm in 45nm node on a mask. However the machine development is delayed in contrast with the speed of the photolithography development. Generally mask manufacturing process is divided into 3 parts. First part is patterning on a mask and second part is inspecting the pattern and repairing the defect on the mask. At that time, inspection tools of transmitted light type are normally used and are the most trustful as progressive type in the developed inspection tools until now. Final part is shipping the mask after the qualifying the issue points and weak points. Issue points on a mask are qualified by using the AIMS (Aerial image measurement system). But this system is including the inherent error possibility, which is AIMS measures the issue points based on the inspection results. It means defects printed on a wafer are over the specific size detected by inspection tools and the inspection tool detects the almost defects. Even though there are no tools to detect the 46nm and 36nm defects suggested by ITRS roadmap, this assumption is applied to manufacturing the 57nm and 45nm device. So we make the programmed defect mask consisted with various defect type such as spot, clear extension, dark extension and CD variation on L/S(line and space), C/H(contact hole) and Active pattern in 55nm and 45nm node. And the programmed defect mask was inspected by using the inspection tool of transmitted light type and was measured by using AIMS 45-193i. Then the marginal defects were compared between the inspection tool and AIMS. Accordingly we could verify whether defect size is proper or not, which was suggested to be controlled on a mask by ITRS roadmap. Also this result could suggest appropriate inspection tools for next generation device among the inspection tools of transmitted light type, reflected light type and aerial image type.

Contact patterning strategies for 32nm and 28nm technology

NASA Astrophysics Data System (ADS)

Morgenfeld, Bradley; Stobert, Ian; An, Ju j.; Kanai, Hideki; Chen, Norman; Aminpur, Massud; Brodsky, Colin; Thomas, Alan

2011-04-01

As 193 nm immersion lithography is extended indefinitely to sustain technology roadmaps, there is increasing pressure to contain escalating lithography costs by identifying patterning solutions that can minimize the use of multiple-pass processes. Contact patterning for the 32/28 nm technology nodes has been greatly facilitated by just-in-time introduction of new process enablers that allow the simultaneous support of flexible foundry-oriented ground rules alongside highperformance technology, while also migrating to a single-pass patterning process. The incorporation of device based performance metrics along with rigorous patterning and structural variability studies were critical in the evaluation of material innovation for improved resolution and CD shrink along with novel data preparation flows utilizing aggressive strategies for SRAF insertion and retargeting.

10 CFR Appendix C to Part 52 - Design Certification Rule for the AP600 Design

Code of Federal Regulations, 2012 CFR

2012-01-01

... 10 Energy 2 2012-01-01 2012-01-01 false Design Certification Rule for the AP600 Design C Appendix C to Part 52 Energy NUCLEAR REGULATORY COMMISSION (CONTINUED) LICENSES, CERTIFICATIONS, AND APPROVALS FOR NUCLEAR POWER PLANTS Pt. 52, App. C Appendix C to Part 52—Design Certification Rule for the...

Rules based process window OPC

NASA Astrophysics Data System (ADS)

O'Brien, Sean; Soper, Robert; Best, Shane; Mason, Mark

2008-03-01

As a preliminary step towards Model-Based Process Window OPC we have analyzed the impact of correcting post-OPC layouts using rules based methods. Image processing on the Brion Tachyon was used to identify sites where the OPC model/recipe failed to generate an acceptable solution. A set of rules for 65nm active and poly were generated by classifying these failure sites. The rules were based upon segment runlengths, figure spaces, and adjacent figure widths. 2.1 million sites for active were corrected in a small chip (comparing the pre and post rules based operations), and 59 million were found at poly. Tachyon analysis of the final reticle layout found weak margin sites distinct from those sites repaired by rules-based corrections. For the active layer more than 75% of the sites corrected by rules would have printed without a defect indicating that most rulesbased cleanups degrade the lithographic pattern. Some sites were missed by the rules based cleanups due to either bugs in the DRC software or gaps in the rules table. In the end dramatic changes to the reticle prevented catastrophic lithography errors, but this method is far too blunt. A more subtle model-based procedure is needed changing only those sites which have unsatisfactory lithographic margin.

A novel methodology for building robust design rules by using design based metrology (DBM)

NASA Astrophysics Data System (ADS)

Lee, Myeongdong; Choi, Seiryung; Choi, Jinwoo; Kim, Jeahyun; Sung, Hyunju; Yeo, Hyunyoung; Shim, Myoungseob; Jin, Gyoyoung; Chung, Eunseung; Roh, Yonghan

2013-03-01

This paper addresses a methodology for building robust design rules by using design based metrology (DBM). Conventional method for building design rules has been using a simulation tool and a simple pattern spider mask. At the early stage of the device, the estimation of simulation tool is poor. And the evaluation of the simple pattern spider mask is rather subjective because it depends on the experiential judgment of an engineer. In this work, we designed a huge number of pattern situations including various 1D and 2D design structures. In order to overcome the difficulties of inspecting many types of patterns, we introduced Design Based Metrology (DBM) of Nano Geometry Research, Inc. And those mass patterns could be inspected at a fast speed with DBM. We also carried out quantitative analysis on PWQ silicon data to estimate process variability. Our methodology demonstrates high speed and accuracy for building design rules. All of test patterns were inspected within a few hours. Mass silicon data were handled with not personal decision but statistical processing. From the results, robust design rules are successfully verified and extracted. Finally we found out that our methodology is appropriate for building robust design rules.

A random approach of test macro generation for early detection of hotspots

NASA Astrophysics Data System (ADS)

Lee, Jong-hyun; Kim, Chin; Kang, Minsoo; Hwang, Sungwook; Yang, Jae-seok; Harb, Mohammed; Al-Imam, Mohamed; Madkour, Kareem; ElManhawy, Wael; Kwan, Joe

2016-03-01

Multiple-Patterning Technology (MPT) is still the preferred choice over EUV for the advanced technology nodes, starting the 20nm node. Down the way to 7nm and 5nm nodes, Self-Aligned Multiple Patterning (SAMP) appears to be one of the effective multiple patterning techniques in terms of achieving small pitch of printed lines on wafer, yet its yield is in question. Predicting and enhancing the yield in the early stages of technology development are some of the main objectives for creating test macros on test masks. While conventional yield ramp techniques for a new technology node have relied on using designs from previous technology nodes as a starting point to identify patterns for Design of Experiment (DoE) creation, these techniques are challenging to apply in the case of introducing an MPT technique like SAMP that did not exist in previous nodes. This paper presents a new strategy for generating test structures based on random placement of unit patterns that can construct more meaningful bigger patterns. Specifications governing the relationships between those unit patterns can be adjusted to generate layout clips that look like realistic SAMP designs. A via chain can be constructed to connect the random DoE of SAMP structures through a routing layer to external pads for electrical measurement. These clips are decomposed according to the decomposition rules of the technology into the appropriate mandrel and cut masks. The decomposed clips can be tested through simulations, or electrically on silicon to discover hotspots. The hotspots can be used in optimizing the fabrication process and models to fix them. They can also be used as learning patterns for DFM deck development. By expanding the size of the randomly generated test structures, more hotspots can be detected. This should provide a faster way to enhance the yield of a new technology node.

The LUVOIR Ultraviolet Multi-Object Spectrograph (LUMOS): instrument definition and design

NASA Astrophysics Data System (ADS)

France, Kevin; Fleming, Brian; West, Garrett; McCandliss, Stephan R.; Bolcar, Matthew R.; Harris, Walter; Moustakas, Leonidas; O'Meara, John M.; Pascucci, Ilaria; Rigby, Jane; Schiminovich, David; Tumlinson, Jason

2017-08-01

The Large Ultraviolet/Optical/Infrared Surveyor (LUVOIR) is one of four large mission concepts currently undergoing community study for consideration by the 2020 Astronomy and Astrophysics Decadal Survey. LUVOIR is being designed to pursue an ambitious program of exoplanetary discovery and characterization, cosmic origins astrophysics, and planetary science. The LUVOIR study team is investigating two large telescope apertures (9- and 15-meter primary mirror diameters) and a host of science instruments to carry out the primary mission goals. Many of the exoplanet, cosmic origins, and planetary science goals of LUVOIR require high-throughput, imaging spectroscopy at ultraviolet (100 - 400 nm) wavelengths. The LUVOIR Ultraviolet Multi-Object Spectrograph, LUMOS, is being designed to support all of the UV science requirements of LUVOIR, from exoplanet host star characterization to tomography of circumgalactic halos to water plumes on outer solar system satellites. LUMOS offers point source and multi-object spectroscopy across the UV bandpass, with multiple resolution modes to support different science goals. The instrument will provide low (R = 8,000 - 18,000) and medium (R = 30,000 - 65,000) resolution modes across the far-ultraviolet (FUV: 100 - 200 nm) and nearultraviolet (NUV: 200 - 400 nm) windows, and a very low resolution mode (R = 500) for spectroscopic investigations of extremely faint objects in the FUV. Imaging spectroscopy will be accomplished over a 3 × 1.6 arcminute field-of-view by employing holographically-ruled diffraction gratings to control optical aberrations, microshutter arrays (MSA) built on the heritage of the Near Infrared Spectrograph (NIRSpec) on the James Webb Space Telescope (JWST), advanced optical coatings for high-throughput in the FUV, and next generation large-format photon-counting detectors. The spectroscopic capabilities of LUMOS are augmented by an FUV imaging channel (100 - 200nm, 13 milliarcsecond angular resolution, 2 × 2 arcminute field-of-view) that will employ a complement of narrow- and medium-band filters. The instrument definition, design, and development are being carried out by an instrument study team led by the University of Colorado, Goddard Space Flight Center, and the LUVOIR Science and Technology Definition Team. LUMOS has recently completed a preliminary design in Goddard's Instrument Design Laboratory and is being incorporated into the working LUVOIR mission concept. In this proceeding, we describe the instrument requirements for LUMOS, the instrument design, and technology development recommendations to support the hardware required for LUMOS. We present an overview of LUMOS' observing modes and estimated performance curves for effective area, spectral resolution, and imaging performance. Example "LUMOS 100-hour Highlights" observing programs are presented to demonstrate the potential power of LUVOIR's ultraviolet spectroscopic capabilities.

Airport noise summary, 2000-2002

DOT National Transportation Integrated Search

2002-01-01

This 20002002 edition of the NBAA Airport Noise Summary : shows those airports with noise advisories or rules. These restrictions : range from a simple avoid overflight of school 2 NM south of 09 : approach to a specific decibel level requir...

Mask roughness induced LER: a rule of thumb -- paper

DOE Office of Scientific and Technical Information (OSTI.GOV)

McClinton, Brittany; Naulleau, Patrick

2010-03-12

Much work has already been done on how both the resist and line-edge roughness (LER) on the mask affect the final printed LER. What is poorly understood, however, is the extent to which system-level effects such as mask surface roughness, illumination conditions, and defocus couple to speckle at the image plane, and currently factor into LER limits. Here, we propose a 'rule-of-thumb' simplified solution that provides a fast and powerful method to obtain mask roughness induced LER. We present modeling data on an older generation mask with a roughness of 230 pm as well as the ultimate target roughness ofmore » 50 pm. Moreover, we consider feature sizes of 50 nm and 22 nm, and show that as a function of correlation length, the LER peaks at the condition that the correlation length is approximately equal to the resolution of the imaging optic.« less

Design rules for RCA self-aligned silicon-gate CMOS/SOS process

NASA Technical Reports Server (NTRS)

1977-01-01

The CMOS/SOS design rules prepared by the RCA Solid State Technology Center (SSTC) are described. These rules specify the spacing and width requirements for each of the six design levels, the seventh level being used to define openings in the passivation level. An associated report, entitled Silicon-Gate CMOS/SOS Processing, provides further insight into the usage of these rules.

Design Rules for Life Support Systems

NASA Technical Reports Server (NTRS)

Jones, Harry

2002-01-01

This paper considers some of the common assumptions and engineering rules of thumb used in life support system design. One general design rule is that the longer the mission, the more the life support system should use recycling and regenerable technologies. A more specific rule is that, if the system grows more than half the food, the food plants will supply all the oxygen needed for the crew life support. There are many such design rules that help in planning the analysis of life support systems and in checking results. These rules are typically if-then statements describing the results of steady-state, "back of the envelope," mass flow calculations. They are useful in identifying plausible candidate life support system designs and in rough allocations between resupply and resource recovery. Life support system designers should always review the design rules and make quick steady state calculations before doing detailed design and dynamic simulation. This paper develops the basis for the different assumptions and design rules and discusses how they should be used. We start top-down, with the highest level requirement to sustain human beings in a closed environment off Earth. We consider the crew needs for air, water, and food. We then discuss atmosphere leakage and recycling losses. The needs to support the crew and to make up losses define the fundamental life support system requirements. We consider the trade-offs between resupplying and recycling oxygen, water, and food. The specific choices between resupply and recycling are determined by mission duration, presence of in-situ resources, etc., and are defining parameters of life support system design.

Optical and photoconductivity spectra of novel Ag₂In₂SiS₆ and Ag₂In₂GeS₆ chalcogenide crystals.

PubMed

Chmiel, M; Piasecki, M; Myronchuk, G; Lakshminarayana, G; Reshak, Ali H; Parasyuk, O G; Kogut, Yu; Kityk, I V

2012-06-01

Complex spectral studies of near-band gap and photoconductive spectra for novel Ag(2)In(2)SiS(6) and Ag(2)In(2)GeS(6) single crystals are presented. The spectral dependences of photoconductivity clearly show an existence of spectral maxima within the 450 nm-540 nm and 780 nm-920 nm. The fundamental absorption edge is analyzed by Urbach rule. The origin of the spectral photoconductivity spectral maxima is discussed. Temperature dependences of the spectra were done. The obtained spectral features allow to propose the titled crystals as photosensors. An analysis of the absorption and photoconductivity spectra is given within a framework of oversimplified spectroscopic model of complex chalcogenide crystals. Copyright © 2012 Elsevier B.V. All rights reserved.

A Hybrid Genetic Programming Algorithm for Automated Design of Dispatching Rules.

PubMed

Nguyen, Su; Mei, Yi; Xue, Bing; Zhang, Mengjie

2018-06-04

Designing effective dispatching rules for production systems is a difficult and timeconsuming task if it is done manually. In the last decade, the growth of computing power, advanced machine learning, and optimisation techniques has made the automated design of dispatching rules possible and automatically discovered rules are competitive or outperform existing rules developed by researchers. Genetic programming is one of the most popular approaches to discovering dispatching rules in the literature, especially for complex production systems. However, the large heuristic search space may restrict genetic programming from finding near optimal dispatching rules. This paper develops a new hybrid genetic programming algorithm for dynamic job shop scheduling based on a new representation, a new local search heuristic, and efficient fitness evaluators. Experiments show that the new method is effective regarding the quality of evolved rules. Moreover, evolved rules are also significantly smaller and contain more relevant attributes.

76 FR 13089 - National Priorities List, Final Rule No. 51

Federal Register 2010, 2011, 2012, 2013, 2014

2011-03-10

... 17, 1986, by the Superfund Amendments and Reauthorization Act (``SARA''), Public Law 99-499, 100 Stat... Boulevard, Chicago, IL 60604; 312/886-7572. Brenda Cook, Region 6 (AR, LA, NM, OK, TX), U.S. EPA, 1445 Ross...

Design rules for successful governmental payments for ecosystem services: Taking agri-environmental measures in Germany as an example.

PubMed

Meyer, Claas; Reutter, Michaela; Matzdorf, Bettina; Sattler, Claudia; Schomers, Sarah

2015-07-01

In recent years, increasing attention has been paid to financial environmental policy instruments that have played important roles in solving agri-environmental problems throughout the world, particularly in the European Union and the United States. The ample and increasing literature on Payments for Ecosystem Services (PES) and agri-environmental measures (AEMs), generally understood as governmental PES, shows that certain single design rules may have an impact on the success of a particular measure. Based on this research, we focused on the interplay of several design rules and conducted a comparative analysis of AEMs' institutional arrangements by examining 49 German cases. We analyzed the effects of the design rules and certain rule combinations on the success of AEMs. Compliance and noncompliance with the hypothesized design rules and the success of the AEMs were surveyed by questioning the responsible agricultural administration and the AEMs' mid-term evaluators. The different rules were evaluated in regard to their necessity and sufficiency for success using Qualitative Comparative Analysis (QCA). Our results show that combinations of certain design rules such as environmental goal targeting and area targeting conditioned the success of the AEMs. Hence, we generalize design principles for AEMs and discuss implications for the general advancement of ecosystem services and the PES approach in agri-environmental policies. Moreover, we highlight the relevance of the results for governmental PES program research and design worldwide. Copyright © 2015 Elsevier Ltd. All rights reserved.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Song, Gian; Sun, Zhiqian; Poplawsky, Jonathan D.

The microstructures of a hierarchical-precipitate-strengthened ferritic alloy are characterized, using transmission-electron microscopy (TEM) and atom-probe tomography (APT). The alloy shows duplex precipitates. The primary precipitate with an average edge length of 90 nm consists of NiAl- and Ni2TiAl-type phases, while the secondary precipitate with an average radius of 2 nm is a NiAl-type phase. Based on the APT results, the volume fractions of the primary and secondary precipitates were calculated, using the lever rule to be 17.3 and 2.3 %, respectively.

Portable design rules for bulk CMOS

NASA Technical Reports Server (NTRS)

Griswold, T. W.

1982-01-01

It is pointed out that for the past several years, one school of IC designers has used a simplified set of nMOS geometric design rules (GDR) which is 'portable', in that it can be used by many different nMOS manufacturers. The present investigation is concerned with a preliminary set of design rules for bulk CMOS which has been verified for simple test structures. The GDR are defined in terms of Caltech Intermediate Form (CIF), which is a geometry-description language that defines simple geometrical objects in layers. The layers are abstractions of physical mask layers. The design rules do not presume the existence of any particular design methodology. Attention is given to p-well and n-well CMOS processes, bulk CMOS and CMOS-SOS, CMOS geometric rules, and a description of the advantages of CMOS technology.

Filters for the International Solar Terrestrial Physics (ISTP) mission far ultraviolet imager

NASA Technical Reports Server (NTRS)

Zukic, Muamer; Torr, Douglas G.; Kim, Jongmin; Spann, James F.; Torr, Marsha R.

1993-01-01

The far ultraviolet (FUV) imager for the International Solar Terrestrial Physics (ISTP) mission is designed to image four features of the aurora: O I lines at 130.4 nm and 135.6 nm and the N2 Lyman-Birge-Hopfield (LBH) bands between 140 nm - 160 nm (LBH long) and 160 nm - 180 nm (LBH long). In this paper we report the design and fabrication of narrow-band and broadband filters for the ISTP FUV imager. Narrow-band filters designed and fabricated for the O I lines have a bandwidth of less than 5 nm and a peak transmittance of 23.9 percent and 38.3 percent at 130.4 nm and 135.6 nm, respectively. Broadband filters designed and fabricated for LBH bands have the transmittance close to 60 percent. Blocking of out-of-band wavelengths for all filters is better than 5x10(exp -3) percent with the transmittance at 121.6 nm of less than 10(exp -6) percent.

Pin routability and pin access analysis on standard cells for layout optimization

NASA Astrophysics Data System (ADS)

Chen, Jian; Wang, Jun; Zhu, ChengYu; Xu, Wei; Li, Shuai; Lin, Eason; Ou, Odie; Lai, Ya-Chieh; Qu, Shengrui

2018-03-01

At advanced process nodes, especially at sub-28nm technology, pin accessibility and routability of standard cells has become one of the most challenging design issues due to the limited router tracks and the increased pin density. If this issue can't be found and resolved during the cell design stage, the pin access problem will be very difficult to be fixed in implementation stage and will make the low efficiency for routing. In this paper, we will introduce a holistic approach for the pin accessibility scoring and routability analysis. For accessibility, the systematic calculator which assigns score for each pin will search the available access points, consider the surrounded router layers, basic design rule and allowed via geometry. Based on the score, the "bad" pins can be found and modified. On pin routability analysis, critical pin points (placing via on this point would lead to failed via insertion) will be searched out for either layout optimization guide or set as OBS for via insertion blocking. By using this pin routability and pin access analysis flow, we are able to improve the library quality and performance.

EPE fundamentals and impact of EUV: Will traditional design-rule calculations work in the era of EUV?

NASA Astrophysics Data System (ADS)

Gabor, Allen H.; Brendler, Andrew C.; Brunner, Timothy A.; Chen, Xuemei; Culp, James A.; Levinson, Harry J.

2018-03-01

The relationship between edge placement error, semiconductor design-rule determination and predicted yield in the era of EUV lithography is examined. This paper starts with the basics of edge placement error and then builds up to design-rule calculations. We show that edge placement error (EPE) definitions can be used as the building blocks for design-rule equations but that in the last several years the term "EPE" has been used in the literature to refer to many patterning errors that are not EPE. We then explore the concept of "Good Fields"1 and use it predict the n-sigma value needed for design-rule determination. Specifically, fundamental yield calculations based on the failure opportunities per chip are used to determine at what n-sigma "value" design-rules need to be tested to ensure high yield. The "value" can be a space between two features, an intersect area between two features, a minimum area of a feature, etc. It is shown that across chip variation of design-rule important values needs to be tested at sigma values between seven and eight which is much higher than the four-sigma values traditionally used for design-rule determination. After recommending new statistics be used for design-rule calculations the paper examines the impact of EUV lithography on sources of variation important for design-rule calculations. We show that stochastics can be treated as an effective dose variation that is fully sampled across every chip. Combining the increased within chip variation from EUV with the understanding that across chip variation of design-rule important values needs to not cause a yield loss at significantly higher sigma values than have traditionally been looked at, the conclusion is reached that across-wafer, wafer-to-wafer and lot-to-lot variation will have to overscale for any technology introducing EUV lithography where stochastic noise is a significant fraction of the effective dose variation. We will emphasize stochastic effects on edge placement error distributions and appropriate design-rule setting. While CD distributions with long tails coming from stochastic effects do bring increased risk of failure (especially on chips that may have over a billion failure opportunities per layer) there are other sources of variation that have sharp cutoffs, i.e. have no tails. We will review these sources and show how distributions with different skew and kurtosis values combine.

CD-SEM real time bias correction using reference metrology based modeling

NASA Astrophysics Data System (ADS)

Ukraintsev, V.; Banke, W.; Zagorodnev, G.; Archie, C.; Rana, N.; Pavlovsky, V.; Smirnov, V.; Briginas, I.; Katnani, A.; Vaid, A.

2018-03-01

Accuracy of patterning impacts yield, IC performance and technology time to market. Accuracy of patterning relies on optical proximity correction (OPC) models built using CD-SEM inputs and intra die critical dimension (CD) control based on CD-SEM. Sub-nanometer measurement uncertainty (MU) of CD-SEM is required for current technologies. Reported design and process related bias variation of CD-SEM is in the range of several nanometers. Reference metrology and numerical modeling are used to correct SEM. Both methods are slow to be used for real time bias correction. We report on real time CD-SEM bias correction using empirical models based on reference metrology (RM) data. Significant amount of currently untapped information (sidewall angle, corner rounding, etc.) is obtainable from SEM waveforms. Using additional RM information provided for specific technology (design rules, materials, processes) CD extraction algorithms can be pre-built and then used in real time for accurate CD extraction from regular CD-SEM images. The art and challenge of SEM modeling is in finding robust correlation between SEM waveform features and bias of CD-SEM as well as in minimizing RM inputs needed to create accurate (within the design and process space) model. The new approach was applied to improve CD-SEM accuracy of 45 nm GATE and 32 nm MET1 OPC 1D models. In both cases MU of the state of the art CD-SEM has been improved by 3x and reduced to a nanometer level. Similar approach can be applied to 2D (end of line, contours, etc.) and 3D (sidewall angle, corner rounding, etc.) cases.

A Rule Based Approach to ISS Interior Volume Control and Layout

NASA Technical Reports Server (NTRS)

Peacock, Brian; Maida, Jim; Fitts, David; Dory, Jonathan

2001-01-01

Traditional human factors design involves the development of human factors requirements based on a desire to accommodate a certain percentage of the intended user population. As the product is developed human factors evaluation involves comparison between the resulting design and the specifications. Sometimes performance metrics are involved that allow leniency in the design requirements given that the human performance result is satisfactory. Clearly such approaches may work but they give rise to uncertainty and negotiation. An alternative approach is to adopt human factors design rules that articulate a range of each design continuum over which there are varying outcome expectations and interactions with other variables, including time. These rules are based on a consensus of human factors specialists, designers, managers and customers. The International Space Station faces exactly this challenge in interior volume control, which is based on anthropometric, performance and subjective preference criteria. This paper describes the traditional approach and then proposes a rule-based alternative. The proposed rules involve spatial, temporal and importance dimensions. If successful this rule-based concept could be applied to many traditional human factors design variables and could lead to a more effective and efficient contribution of human factors input to the design process.

Advanced materials for 193-nm resists

NASA Astrophysics Data System (ADS)

Ushirogouchi, Tohru; Asakawa, Koji; Shida, Naomi; Okino, Takeshi; Saito, Satoshi; Funaki, Yoshinori; Takaragi, Akira; Tsutsumi, Kentaro; Nakano, Tatsuya

2000-06-01

Acrylate monomers containing alicyclic side chains featuring a series of polar substituent groups were assumed to be model compounds. Solubility parameters were calculated for the corresponding acrylate polymers. These acrylate monomers were synthesized using a novel aerobic oxidation reaction employing N-hydroxyphtalimide (NHPI) as a catalyst, and then polymerized. These reactions were confirmed to be applicable for the mass-production of those compounds. The calculation results agreed with the hydrophilic parameters measured experimentally. Moreover, the relationship between the resist performance and the above-mentioned solubility parameter has been studied. As a result, a correlation between the resist performance and the calculated solubility parameter was observed. Finally, resolution of 0.13-micron patterns, based on the 1G DRAM design rule, could be successfully fabricated by optimizing the solubility parameter and the resist composition.

Peptide tessellation yields micrometre-scale collagen triple helices

NASA Astrophysics Data System (ADS)

Tanrikulu, I. Caglar; Forticaux, Audrey; Jin, Song; Raines, Ronald T.

2016-11-01

Sticky-ended DNA duplexes can associate spontaneously into long double helices; however, such self-assembly is much less developed with proteins. Collagen is the most prevalent component of the extracellular matrix and a common clinical biomaterial. As for natural DNA, the ~103-residue triple helices (~300 nm) of natural collagen are recalcitrant to chemical synthesis. Here we show how the self-assembly of short collagen-mimetic peptides (CMPs) can enable the fabrication of synthetic collagen triple helices that are nearly a micrometre in length. Inspired by the mathematics of tessellations, we derive rules for the design of single CMPs that self-assemble into long triple helices with perfect symmetry. Sticky ends thus created are uniform across the assembly and drive its growth. Enacting this design yields individual triple helices that, in length, match or exceed those in natural collagen and are remarkably thermostable, despite the absence of higher-order association. The symmetric assembly of CMPs provides an enabling platform for the development of advanced materials for medicine and nanotechnology.

77 FR 68873 - Self-Regulatory Organizations; The NASDAQ Stock Market LLC; Notice of Designation of Longer...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-11-16

...-Regulatory Organizations; The NASDAQ Stock Market LLC; Notice of Designation of Longer Period for Commission Action on Proceedings to Determine Whether to Approve or Disapprove Proposed Rule Change To Establish... proposed rule change to establish various ``Benchmark Orders'' under NASDAQ Rule 4751(f). The proposed rule...

78 FR 6154 - Self-Regulatory Organizations; The NASDAQ Stock Market LLC; Notice of Designation of Longer...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-01-29

...-Regulatory Organizations; The NASDAQ Stock Market LLC; Notice of Designation of Longer Period for Commission Action on Proceedings To Determine Whether To Approve or Disapprove Proposed Rule Change To Amend Rule...,\\2\\ a proposed rule change to amend Exchange Rule 4626--Limitation of Liability (``accommodation...

Characterization of sub-0.18-μm critical dimension pattern collapse for yield improvement

NASA Astrophysics Data System (ADS)

Zhong, Tom X.; Gurer, Emir; Lee, Ed C.; Bai, Hong; Gendron, Bill; Krishna, Murthy S.; Reynolds, Reese M.

1999-09-01

In this study, we demonstrate that surface-resist interface interactions are becoming more crucial in DUV lithography as we enter deep into the sub-wavelength era of smaller critical dimension (CD) size and high aspect ratio. This interaction reveals itself as an adhesion reduction of the resist film due to the smaller contact area between the feature and the substrate. Considerable yield improvements in a manufacturing environment can be realized if pattern collapsing of smaller features is prevented by means of proper priming. In addition, next generation photoresist processing equipments must be able to deliver excellent on-wafer results with minimum chemical consumption as environmental health and safety (EHS) requirements are better appreciated in the marketplace. HMDS is not only highly toxic but it is also a prime threat to CD control of most deep ultra violet (DUV) photoresists used for sub-0.18 micrometer design rules. The by-product NH3 created during priming process with HMDS can neutralize the photo-acid created during the exposure step. There are many technical opportunities in this usually neglected priming process step. In this study, we characterized sub-0.18 micrometer isolated line pattern collapse for UV5 resist on bare Si wafers by using a scanning electron microscope (SEM). The smallest line width printability on wafers primed with different contact angles was analyzed by using both top down and cross section SEM images. Our results show that there is a strong effect of substrate surface and film interface interaction on device yields. More specifically, there is a strong correlation between pattern integrity of features down to 115 nm and vapor prime process conditions. In general, wafers with higher contact angle can support smaller line widths. These results suggest that higher contact angle than the current specification will be required for sub-0.1 micrometer design rule for improved yield. An alternative material to HMDS will probably be needed due to more stringent future requirements and weak bonding characteristics of HMDS. Based on the result of this study, we propose an HMDS consumption reduction scheme for line-widths above 0.2 micrometer. There are many priming-related modular and system level technical enhancements that can be designed in the next generation photoresist processing tools in order to extend 248 nm lithography towards smaller feature sizes.

Design Characteristics Influence Performance of Clinical Prediction Rules in Validation: A Meta-Epidemiological Study.

PubMed

Ban, Jong-Wook; Emparanza, José Ignacio; Urreta, Iratxe; Burls, Amanda

2016-01-01

Many new clinical prediction rules are derived and validated. But the design and reporting quality of clinical prediction research has been less than optimal. We aimed to assess whether design characteristics of validation studies were associated with the overestimation of clinical prediction rules' performance. We also aimed to evaluate whether validation studies clearly reported important methodological characteristics. Electronic databases were searched for systematic reviews of clinical prediction rule studies published between 2006 and 2010. Data were extracted from the eligible validation studies included in the systematic reviews. A meta-analytic meta-epidemiological approach was used to assess the influence of design characteristics on predictive performance. From each validation study, it was assessed whether 7 design and 7 reporting characteristics were properly described. A total of 287 validation studies of clinical prediction rule were collected from 15 systematic reviews (31 meta-analyses). Validation studies using case-control design produced a summary diagnostic odds ratio (DOR) 2.2 times (95% CI: 1.2-4.3) larger than validation studies using cohort design and unclear design. When differential verification was used, the summary DOR was overestimated by twofold (95% CI: 1.2 -3.1) compared to complete, partial and unclear verification. The summary RDOR of validation studies with inadequate sample size was 1.9 (95% CI: 1.2 -3.1) compared to studies with adequate sample size. Study site, reliability, and clinical prediction rule was adequately described in 10.1%, 9.4%, and 7.0% of validation studies respectively. Validation studies with design shortcomings may overestimate the performance of clinical prediction rules. The quality of reporting among studies validating clinical prediction rules needs to be improved.

Characterization and improvement of field CD uniformity for implementation of 0.15-μm technology device using KrF stepper

NASA Astrophysics Data System (ADS)

Hyun, Yoon-Suk; Kim, Dong-Joo; Koh, Cha-Won; Park, Sung-Nam; Kwon, Won-Taik

2003-06-01

xAs the design rule of semiconductor device shrinks, the field CD uniformity gets more important. For mass production of 0.15 μm technology device using KrF stepper having 0.63NA, the improvement of field CD uniformity was one of key issues because field CD uniformity is directly related to device characteristics in some layers. We have experienced steppers that show poor illumination uniformity. With those steppers there was large CD difference of about 10nm between field center and field edges as shown in Figure 1. Although we were using verified reticles, we could not get an acceptable CD uniformity in a field with those steppers. The Field CD uniformity is dominantly dependent of the illumination uniformity of stepper and mask quality. With these optimization, we could control DICD difference between field center and edge to be less than 5nm. In this paper, we characterized the dependency of field CD uniformity according to illumination systems with stepper and scanner, annular illumination uniformity at various stigma, mask CD uniformity and the several types of novel gray filter specifically developed.

Understanding the Molecular Determinant of Reversible Human Monoamine Oxidase B Inhibitors Containing 2H-Chromen-2-One Core: Structure-Based and Ligand-Based Derived Three-Dimensional Quantitative Structure-Activity Relationships Predictive Models.

PubMed

Mladenović, Milan; Patsilinakos, Alexandros; Pirolli, Adele; Sabatino, Manuela; Ragno, Rino

2017-04-24

Monoamine oxidase B (MAO B) catalyzes the oxidative deamination of aryalkylamines neurotransmitters with concomitant reduction of oxygen to hydrogen peroxide. Consequently, the enzyme's malfunction can induce oxidative damage to mitochondrial DNA and mediates development of Parkinson's disease. Thus, MAO B emerges as a promising target for developing pharmaceuticals potentially useful to treat this vicious neurodegenerative condition. Aiming to contribute to the development of drugs with the reversible mechanism of MAO B inhibition only, herein, an extended in silico-in vitro procedure for the selection of novel MAO B inhibitors is demonstrated, including the following: (1) definition of optimized and validated structure-based three-dimensional (3-D) quantitative structure-activity relationships (QSAR) models derived from available cocrystallized inhibitor-MAO B complexes; (2) elaboration of SAR features for either irreversible or reversible MAO B inhibitors to characterize and improve coumarin-based inhibitor activity (Protein Data Bank ID: 2V61 ) as the most potent reversible lead compound; (3) definition of structure-based (SB) and ligand-based (LB) alignment rule assessments by which virtually any untested potential MAO B inhibitor might be evaluated; (4) predictive ability validation of the best 3-D QSAR model through SB/LB modeling of four coumarin-based external test sets (267 compounds); (5) design and SB/LB alignment of novel coumarin-based scaffolds experimentally validated through synthesis and biological evaluation in vitro. Due to the wide range of molecular diversity within the 3-D QSAR training set and derived features, the selected N probe-derived 3-D QSAR model proves to be a valuable tool for virtual screening (VS) of novel MAO B inhibitors and a platform for design, synthesis and evaluation of novel active structures. Accordingly, six highly active and selective MAO B inhibitors (picomolar to low nanomolar range of activity) were disclosed as a result of rational SB/LB 3D QSAR design; therefore, D123 (IC 50 = 0.83 nM, K i = 0.25 nM) and D124 (IC 50 = 0.97 nM, K i = 0.29 nM) are potential lead candidates as anti-Parkinson's drugs.

78 FR 31464 - National Priorities List, Proposed Rule No. 58

Federal Register 2010, 2011, 2012, 2013, 2014

2013-05-24

... Boulevard, Chicago, IL 60604; 312/ 886-4465. Brenda Cook, Region 6 (AR, LA, NM, OK, TX), U.S. EPA, 1445 Ross... criteria (Northside Sanitary Landfill v. Thomas, 849 F.2d 1516 (D.C. Cir. 1988)). The EPA will not address...

Data-driven backward chaining

NASA Technical Reports Server (NTRS)

Haley, Paul

1991-01-01

The C Language Integrated Production System (CLIPS) cannot effectively perform sound and complete logical inference in most real-world contexts. The problem facing CLIPS is its lack of goal generation. Without automatic goal generation and maintenance, forward chaining can only deduce all instances of a relationship. Backward chaining, which requires goal generation, allows deduction of only that subset of what is logically true which is also relevant to ongoing problem solving. Goal generation can be mimicked in simple cases using forward chaining. However, such mimicry requires manual coding of additional rules which can assert an inadequate goal representation for every condition in every rule that can have corresponding facts derived by backward chaining. In general, for N rules with an average of M conditions per rule the number of goal generation rules required is on the order of N*M. This is clearly intractable from a program maintenance perspective. We describe the support in Eclipse for backward chaining which it automatically asserts as it checks rule conditions. Important characteristics of this extension are that it does not assert goals which cannot match any rule conditions, that 2 equivalent goals are never asserted, and that goals persist as long as, but no longer than, they remain relevant.

77 FR 65037 - Self-Regulatory Organizations; C2 Options Exchange, Incorporated; Order Approving a Proposed Rule...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-10-24

... Organizations; C2 Options Exchange, Incorporated; Order Approving a Proposed Rule Change To Adopt a Designated... thereunder,\\2\\ a proposed rule change to adopt a Designated Primary Market-Maker (``DPM'') program. The... the Notice, C2 has proposed to adopt a DPM program. The associated proposed rules are based on the...

Aligned silica nanowires on the inner wall of bubble-like silica film: the growth mechanism and photoluminescence.

PubMed

Chen, Yiqing; Zhou, Qingtao; Jiang, Haifeng; Su, Yong; Xiao, Haihua; Zhu, Li-Ang; Xu, Liang

2006-02-28

Large area, aligned amorphous silica nanowires grow on the inner wall of bubble-like silica film, which is prepared by thermal evaporation of a molten gallium-silicon alloy in a flow of ammonia. These nanowires are 10-20 nm in diameter and 0.5-1.5 µm in length. The bubble-like silica film functions as a substrate, guiding the growth of silica nanowires by a vapour-solid process. This work helps us to clearly elucidate the growth mechanism of aligned amorphous silica nanowires, ruling out the possibility of liquid gallium acting as a nucleation substrate for the growth of the aligned silica nanowires. A broad emission band from 290 to 600 nm is observed in the photoluminescence (PL) spectrum of these nanowires. There are seven PL peaks: two blue emission peaks at 430 nm (2.88 eV) and 475 nm (2.61 eV); and five ultraviolet emission peaks at 325 nm (3.82 eV), 350 nm (3.54 eV), 365 nm (3.40 eV), 385 nm (3.22 eV) and 390 nm (3.18 eV), which may be related to various oxygen defects.

75 FR 17816 - Self-Regulatory Organizations; Notice of Filing and Immediate Effectiveness of Proposed Rule...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-04-07

... Stock Exchange LLC Amending NYSE Rule 1 To Provide for the Designation of Qualified Employees and NYSE... qualified employees to act in place of any person named in a rule as having authority to act under such rule... 1 to provide that the Exchange may formally designate one or more qualified employees to act in...

Examining the Rule of Thumb of Not Using Multilevel Modeling: The "Design Effect Smaller than Two" Rule

ERIC Educational Resources Information Center

Lai, Mark H. C.; Kwok, Oi-man

2015-01-01

Educational researchers commonly use the rule of thumb of "design effect smaller than 2" as the justification of not accounting for the multilevel or clustered structure in their data. The rule, however, has not yet been systematically studied in previous research. In the present study, we generated data from three different models…

DOE Office of Scientific and Technical Information (OSTI.GOV)

Deng, Junjing; Hong, Young Pyo; Chen, Si

Modern integrated circuits (ICs) employ a myriad of materials organized at nanoscale dimensions, and certain critical tolerances must be met for them to function. To understand departures from intended functionality, it is essential to examine ICs as manufactured so as to adjust design rules ideally in a nondestructive way so that imaged structures can be correlated with electrical performance. Electron microscopes can do this on thin regions or on exposed surfaces, but the required processing alters or even destroys functionality. Microscopy with multi-keV x-rays provides an alternative approach with greater penetration, but the spatial resolution of x-ray imaging lenses hasmore » not allowed one to see the required detail in the latest generation of ICs. X-ray ptychography provides a way to obtain images of ICs without lens-imposed resolution limits with past work delivering 20–40-nm resolution on thinned ICs. We describe a simple model for estimating the required exposure and use it to estimate the future potential for this technique. Here we show that this approach can be used to image circuit detail through an unprocessed 300-μm-thick silicon wafer with sub-20-nm detail clearly resolved after mechanical polishing to 240-μm thickness was used to eliminate image contrast caused by Si wafer surface scratches. Here, by using continuous x-ray scanning, massively parallel computation, and a new generation of synchrotron light sources, this should enable entire nonetched ICs to be imaged to 10-nm resolution or better while maintaining their ability to function in electrical tests.« less

Anticipating and controlling mask costs within EDA physical design

NASA Astrophysics Data System (ADS)

Rieger, Michael L.; Mayhew, Jeffrey P.; Melvin, Lawrence S.; Lugg, Robert M.; Beale, Daniel F.

2003-08-01

For low k1 lithography, more aggressive OPC is being applied to critical layers, and the number of mask layers with OPC treatments is growing rapidly. The 130 nm, process node required, on average, 8 layers containing rules- or model-based OPC. The 90 nm node will have 16 OPC layers, of which 14 layers contain aggressive model-based OPC. This escalation of mask pattern complexity, coupled with the predominant use of vector-scan e-beam (VSB) mask writers contributes to the rising costs of advanced mask sets. Writing times for OPC layouts are several times longer than for traditional layouts, making mask exposure the single largest cost component for OPC masks. Lower mask yields, another key factor in higher mask costs, is also aggravated by OPC. Historical mask set costs are plotted below. The initial cost of a 90 nm-node mask set will exceed one million dollars. The relative impact of mask cost on chip depends on how many total wafers are printed with each mask set. For many foundry chips, where unit production is often well below 1000 wafers, mask costs are larger than wafer processing costs. Further increases in NRE may begin to discourage these suppliers' adoption to 90 nm and smaller nodes. In this paper we will outline several alternatives for reducing mask costs by strategically leveraging dimensional margins. Dimensional specifications for a particular masking layer usually are applied uniformly to all features on that layer. As a practical matter, accuracy requirements on different features in the design may vary widely. Take a polysilicon layer, for example: global tolerance specifications for that layer are driven by the transistor-gate requirements; but these parameters over-specify interconnect feature requirements. By identifying features where dimensional accuracy requirements can be reduced, additional margin can be leveraged to reduce OPC complexity. Mask writing time on VSB tools will drop in nearly direct proportion to reduce shot count. By inspecting masks with reference to feature-dependent margins, instead of uniform specifications, mask yield can be effectively increased further reducing delivered mask expense.

16-channel arrayed waveguide grating (AWG) demultiplexer design on SOI wafer for application in CWDM-PON

NASA Astrophysics Data System (ADS)

Juhari, Nurjuliana; Menon, P. Susthitha; Ehsan, Abang Annuar; Shaari, Sahbudin

2015-01-01

Arrayed Waveguide Grating (AWG) functioning as a demultiplexer is designed on SOI platform with rib waveguide structure to be utilized in coarse wavelength division multiplexing-passive optical network (CWDM-PON) systems. Two design approaches; conventional and tapered configuration of AWG was developed with channel spacing of 20 nm that covers the standard transmission spectrum of CWDM ranging from 1311 nm to 1611 nm. The performance of insertion loss for tapered configuration offered the lowest insertion loss of 0.77 dB but the adjacent crosstalk gave non-significant relation for both designs. With average channel spacing of 20.4 nm, the nominal central wavelength of this design is close to the standard CWDM wavelength grid over 484 nm free spectrum range (FSR).

78 FR 72968 - Self-Regulatory Organizations; New York Stock Exchange LLC; Notice of Filing of Proposed Rule...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-12-04

... Capital Commitment Schedule (``CCS'') interest; (3) NYSE Rule 70.25 to permit d-Quotes to be designated... that MPL Orders may interact with CCS interest; (3) NYSE Rule 70.25 to permit d- Quotes to be... the CCS pursuant to Rule 1000 would not be permitted to be designated as MPL Orders. The CCS is a...

Manufacturability improvements in EUV resist processing toward NXE:3300 processing

NASA Astrophysics Data System (ADS)

Kuwahara, Yuhei; Matsunaga, Koichi; Shimoaoki, Takeshi; Kawakami, Shinichiro; Nafus, Kathleen; Foubert, Philippe; Goethals, Anne-Marie; Shimura, Satoru

2014-03-01

As the design rule of semiconductor process gets finer, extreme ultraviolet lithography (EUVL) technology is aggressively studied as a process for 22nm half pitch and beyond. At present, the studies for EUV focus on manufacturability. It requires fine resolution, uniform, smooth patterns and low defectivity, not only after lithography but also after the etch process. In the first half of 2013, a CLEAN TRACKTM LITHIUS ProTMZ-EUV was installed at imec for POR development in preparation of the ASML NXE:3300. This next generation coating/developing system is equipped with state of the art defect reduction technology. This tool with advanced functions can achieve low defect levels. This paper reports on the progress towards manufacturing defectivity levels and latest optimizations towards the NXE:3300 POR for both lines/spaces and contact holes at imec.

Microeconomics of advanced process window control for 50-nm gates

NASA Astrophysics Data System (ADS)

Monahan, Kevin M.; Chen, Xuemei; Falessi, Georges; Garvin, Craig; Hankinson, Matt; Lev, Amir; Levy, Ady; Slessor, Michael D.

2002-07-01

Fundamentally, advanced process control enables accelerated design-rule reduction, but simple microeconomic models that directly link the effects of advanced process control to profitability are rare or non-existent. In this work, we derive these links using a simplified model for the rate of profit generated by the semiconductor manufacturing process. We use it to explain why and how microprocessor manufacturers strive to avoid commoditization by producing only the number of dies required to satisfy the time-varying demand in each performance segment. This strategy is realized using the tactic known as speed binning, the deliberate creation of an unnatural distribution of microprocessor performance that varies according to market demand. We show that the ability of APC to achieve these economic objectives may be limited by variability in the larger manufacturing context, including measurement delays and process window variation.

50 CFR 424.16 - Proposed rules.

Code of Federal Regulations, 2011 CFR

2011-10-01

... OF COMMERCE); ENDANGERED SPECIES COMMITTEE REGULATIONS SUBCHAPTER A LISTING ENDANGERED AND THREATENED SPECIES AND DESIGNATING CRITICAL HABITAT Revision of the Lists § 424.16 Proposed rules. (a) General. Based... any proposed rule to list, delist, or reclassify a species, or to designate or revise critical habitat...

77 FR 38477 - IFR Altitudes; Miscellaneous Amendments

Federal Register 2010, 2011, 2012, 2013, 2014

2012-06-28

... CONSEQUENCES, NM VORTAC. Sec. 95.4000 High Altitude RNAV Routes Sec. 95.4130 RNAV Route Q130 is Amended to Read.... No. 501] IFR Altitudes; Miscellaneous Amendments AGENCY: Federal Aviation Administration (FAA), DOT... (instrument flight rules) altitudes and changeover points for certain Federal airways, jet routes, or direct...

78 FR 67292 - Amendment of Class E Airspace; Carlsbad, NM

Federal Register 2010, 2011, 2012, 2013, 2014

2013-11-12

...) Standard Instrument Approach Procedures at Cavern City Air Terminal. The FAA is taking this action to enhance the safety and management of Instrument Flight Rule (IFR) operations at the airport. DATES... feet above the surface to contain aircraft executing new standard instrument approach procedures at...

77 FR 17327 - Airworthiness Directives; Airbus Airplanes

Federal Register 2010, 2011, 2012, 2013, 2014

2012-03-26

... DEPARTMENT OF TRANSPORTATION Federal Aviation Administration 14 CFR Part 39 [Docket No. FAA-2011-1087; Directorate Identifier 2011-NM-032-AD; Amendment 39-16967; AD 2012-04-11] RIN 2120-AA64 Airworthiness Directives; Airbus Airplanes Correction In rule document 2012-5859 appearing on pages 14679-14681...

Design Characteristics Influence Performance of Clinical Prediction Rules in Validation: A Meta-Epidemiological Study

PubMed Central

Ban, Jong-Wook; Emparanza, José Ignacio; Urreta, Iratxe; Burls, Amanda

2016-01-01

Background Many new clinical prediction rules are derived and validated. But the design and reporting quality of clinical prediction research has been less than optimal. We aimed to assess whether design characteristics of validation studies were associated with the overestimation of clinical prediction rules’ performance. We also aimed to evaluate whether validation studies clearly reported important methodological characteristics. Methods Electronic databases were searched for systematic reviews of clinical prediction rule studies published between 2006 and 2010. Data were extracted from the eligible validation studies included in the systematic reviews. A meta-analytic meta-epidemiological approach was used to assess the influence of design characteristics on predictive performance. From each validation study, it was assessed whether 7 design and 7 reporting characteristics were properly described. Results A total of 287 validation studies of clinical prediction rule were collected from 15 systematic reviews (31 meta-analyses). Validation studies using case-control design produced a summary diagnostic odds ratio (DOR) 2.2 times (95% CI: 1.2–4.3) larger than validation studies using cohort design and unclear design. When differential verification was used, the summary DOR was overestimated by twofold (95% CI: 1.2 -3.1) compared to complete, partial and unclear verification. The summary RDOR of validation studies with inadequate sample size was 1.9 (95% CI: 1.2 -3.1) compared to studies with adequate sample size. Study site, reliability, and clinical prediction rule was adequately described in 10.1%, 9.4%, and 7.0% of validation studies respectively. Conclusion Validation studies with design shortcomings may overestimate the performance of clinical prediction rules. The quality of reporting among studies validating clinical prediction rules needs to be improved. PMID:26730980

Attribute index and uniform design based multiobjective association rule mining with evolutionary algorithm.

PubMed

Zhang, Jie; Wang, Yuping; Feng, Junhong

2013-01-01

In association rule mining, evaluating an association rule needs to repeatedly scan database to compare the whole database with the antecedent, consequent of a rule and the whole rule. In order to decrease the number of comparisons and time consuming, we present an attribute index strategy. It only needs to scan database once to create the attribute index of each attribute. Then all metrics values to evaluate an association rule do not need to scan database any further, but acquire data only by means of the attribute indices. The paper visualizes association rule mining as a multiobjective problem rather than a single objective one. In order to make the acquired solutions scatter uniformly toward the Pareto frontier in the objective space, elitism policy and uniform design are introduced. The paper presents the algorithm of attribute index and uniform design based multiobjective association rule mining with evolutionary algorithm, abbreviated as IUARMMEA. It does not require the user-specified minimum support and minimum confidence anymore, but uses a simple attribute index. It uses a well-designed real encoding so as to extend its application scope. Experiments performed on several databases demonstrate that the proposed algorithm has excellent performance, and it can significantly reduce the number of comparisons and time consumption.

Attribute Index and Uniform Design Based Multiobjective Association Rule Mining with Evolutionary Algorithm

PubMed Central

Wang, Yuping; Feng, Junhong

2013-01-01

In association rule mining, evaluating an association rule needs to repeatedly scan database to compare the whole database with the antecedent, consequent of a rule and the whole rule. In order to decrease the number of comparisons and time consuming, we present an attribute index strategy. It only needs to scan database once to create the attribute index of each attribute. Then all metrics values to evaluate an association rule do not need to scan database any further, but acquire data only by means of the attribute indices. The paper visualizes association rule mining as a multiobjective problem rather than a single objective one. In order to make the acquired solutions scatter uniformly toward the Pareto frontier in the objective space, elitism policy and uniform design are introduced. The paper presents the algorithm of attribute index and uniform design based multiobjective association rule mining with evolutionary algorithm, abbreviated as IUARMMEA. It does not require the user-specified minimum support and minimum confidence anymore, but uses a simple attribute index. It uses a well-designed real encoding so as to extend its application scope. Experiments performed on several databases demonstrate that the proposed algorithm has excellent performance, and it can significantly reduce the number of comparisons and time consumption. PMID:23766683

A General Design Rule to Manipulate Photocarrier Transport Path in Solar Cells and Its Realization by the Plasmonic-Electrical Effect

NASA Astrophysics Data System (ADS)

Sha, Wei E. I.; Zhu, Hugh L.; Chen, Luzhou; Chew, Weng Cho; Choy, Wallace C. H.

2015-02-01

It is well known that transport paths of photocarriers (electrons and holes) before collected by electrodes strongly affect bulk recombination and thus electrical properties of solar cells, including open-circuit voltage and fill factor. For boosting device performance, a general design rule, tailored to arbitrary electron to hole mobility ratio, is proposed to decide the transport paths of photocarriers. Due to a unique ability to localize and concentrate light, plasmonics is explored to manipulate photocarrier transport through spatially redistributing light absorption at the active layer of devices. Without changing the active materials, we conceive a plasmonic-electrical concept, which tunes electrical properties of solar cells via the plasmon-modified optical field distribution, to realize the design rule. Incorporating spectrally and spatially configurable metallic nanostructures, thin-film solar cells are theoretically modelled and experimentally fabricated to validate the design rule and verify the plasmonic-tunable electrical properties. The general design rule, together with the plasmonic-electrical effect, contributes to the evolution of emerging photovoltaics.

A business rules design framework for a pharmaceutical validation and alert system.

PubMed

Boussadi, A; Bousquet, C; Sabatier, B; Caruba, T; Durieux, P; Degoulet, P

2011-01-01

Several alert systems have been developed to improve the patient safety aspects of clinical information systems (CIS). Most studies have focused on the evaluation of these systems, with little information provided about the methodology leading to system implementation. We propose here an 'agile' business rule design framework (BRDF) supporting both the design of alerts for the validation of drug prescriptions and the incorporation of the end user into the design process. We analyzed the unified process (UP) design life cycle and defined the activities, subactivities, actors and UML artifacts that could be used to enhance the agility of the proposed framework. We then applied the proposed framework to two different sets of data in the context of the Georges Pompidou University Hospital (HEGP) CIS. We introduced two new subactivities into UP: business rule specification and business rule instantiation activity. The pharmacist made an effective contribution to five of the eight BRDF design activities. Validation of the two new subactivities was effected in the context of drug dosage adaption to the patients' clinical and biological contexts. Pilot experiment shows that business rules modeled with BRDF and implemented as an alert system triggered an alert for 5824 of the 71,413 prescriptions considered (8.16%). A business rule design framework approach meets one of the strategic objectives for decision support design by taking into account three important criteria posing a particular challenge to system designers: 1) business processes, 2) knowledge modeling of the context of application, and 3) the agility of the various design steps.

40 CFR 62.1100 - Identification of plan.

Code of Federal Regulations, 2010 CFR

2010-07-01

...) APPROVAL AND PROMULGATION OF STATE PLANS FOR DESIGNATED FACILITIES AND POLLUTANTS California Plan for the... of plan. (a) State of California Designated Facility Plan (Section 111(d) Plan). (b) The plan was... Pollution Control District Regulation 1; Rule 130—Definitions, Rule 240—Permit to Operate, Rule 450—Sulfide...

40 CFR 62.1100 - Identification of plan.

Code of Federal Regulations, 2013 CFR

2013-07-01

...) APPROVAL AND PROMULGATION OF STATE PLANS FOR DESIGNATED FACILITIES AND POLLUTANTS California Plan for the... of plan. (a) State of California Designated Facility Plan (Section 111(d) Plan). (b) The plan was... Pollution Control District Regulation 1; Rule 130—Definitions, Rule 240—Permit to Operate, Rule 450—Sulfide...

40 CFR 62.1100 - Identification of plan.

Code of Federal Regulations, 2012 CFR

2012-07-01

...) APPROVAL AND PROMULGATION OF STATE PLANS FOR DESIGNATED FACILITIES AND POLLUTANTS California Plan for the... of plan. (a) State of California Designated Facility Plan (Section 111(d) Plan). (b) The plan was... Pollution Control District Regulation 1; Rule 130—Definitions, Rule 240—Permit to Operate, Rule 450—Sulfide...

40 CFR 62.1100 - Identification of plan.

Code of Federal Regulations, 2014 CFR

2014-07-01

...) APPROVAL AND PROMULGATION OF STATE PLANS FOR DESIGNATED FACILITIES AND POLLUTANTS California Plan for the... of plan. (a) State of California Designated Facility Plan (Section 111(d) Plan). (b) The plan was... Pollution Control District Regulation 1; Rule 130—Definitions, Rule 240—Permit to Operate, Rule 450—Sulfide...

40 CFR 62.1100 - Identification of plan.

Code of Federal Regulations, 2011 CFR

2011-07-01

...) APPROVAL AND PROMULGATION OF STATE PLANS FOR DESIGNATED FACILITIES AND POLLUTANTS California Plan for the... of plan. (a) State of California Designated Facility Plan (Section 111(d) Plan). (b) The plan was... Pollution Control District Regulation 1; Rule 130—Definitions, Rule 240—Permit to Operate, Rule 450—Sulfide...

78 FR 24331 - Apricots Grown in Designated Counties in Washington; Temporary Suspension of Handling Regulations

Federal Register 2010, 2011, 2012, 2013, 2014

2013-04-25

... DEPARTMENT OF AGRICULTURE Agricultural Marketing Service 7 CFR Part 922 [Docket No. AMS-FV-12-0028... Regulations AGENCY: Agricultural Marketing Service, USDA. ACTION: Affirmation of interim rule as final rule... the marketing order for apricots grown in designated Counties in Washington. The interim rule...

DEVELOPMENT OF ASME SECTION X CODE RULES FOR HIGH PRESSURE COMPOSITE HYDROGEN PRESSURE VESSELS WITH NON-LOAD SHARING LINERS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Rawls, G.; Newhouse, N.; Rana, M.

2010-04-13

The Boiler and Pressure Vessel Project Team on Hydrogen Tanks was formed in 2004 to develop Code rules to address the various needs that had been identified for the design and construction of up to 15000 psi hydrogen storage vessel. One of these needs was the development of Code rules for high pressure composite vessels with non-load sharing liners for stationary applications. In 2009, ASME approved new Appendix 8, for Section X Code which contains the rules for these vessels. These vessels are designated as Class III vessels with design pressure ranging from 20.7 MPa (3,000 ps)i to 103.4 MPamore » (15,000 psi) and maximum allowable outside liner diameter of 2.54 m (100 inches). The maximum design life of these vessels is limited to 20 years. Design, fabrication, and examination requirements have been specified, included Acoustic Emission testing at time of manufacture. The Code rules include the design qualification testing of prototype vessels. Qualification includes proof, expansion, burst, cyclic fatigue, creep, flaw, permeability, torque, penetration, and environmental testing.« less

78 FR 78300 - Proposed Establishment of Class E Airspace; Albuquerque, NM

Federal Register 2010, 2011, 2012, 2013, 2014

2013-12-26

... Instrument Flight Rules (IFR) aircraft under control of Albuquerque Air Route Traffic Control Center (ARTCC... be changed in light of comments received. All comments submitted will be available for examination in... http://www.faa.gov/airports_airtraffic/air_traffic/publications/airspace_amendments/ . You may review...

78 FR 77023 - Proposed Establishment of Class E Airspace; Tucumcari, NM

Federal Register 2010, 2011, 2012, 2013, 2014

2013-12-20

... Instrument Flight Rules (IFR) aircraft under control of Albuquerque Air Route Traffic Control Center (ARTCC... be changed in light of comments received. All comments submitted will be available for examination in... http://www.faa.gov/airports_airtraffic/air_traffic/publications/airspace_amendments/ . You may review...

78 FR 49915 - Airworthiness Directives; Airbus Airplanes

Federal Register 2010, 2011, 2012, 2013, 2014

2013-08-16

... 2004-15-07, Amendment 39-13741 (69 FR 44592, July 27, 2004)], a reassessment of the previous fatigue...-1321; Directorate Identifier 2011-NM-147-AD; Amendment 39-17528; AD 2013-15-12] RIN 2120-AA64... Transportation (DOT). ACTION: Final rule. SUMMARY: We are superseding airworthiness directive (AD) 2004-15-07...

Bipartite design of a self-fibrillating protein copolymer with nanopatterned peptide display capabilities.

PubMed

Bruning, Marc; Kreplak, Laurent; Leopoldseder, Sonja; Müller, Shirley A; Ringler, Philippe; Duchesne, Laurence; Fernig, David G; Engel, Andreas; Ucurum-Fotiadis, Zöhre; Mayans, Olga

2010-11-10

The development of biomatrices for technological and biomedical applications employs self-assembled scaffolds built from short peptidic motifs. However, biopolymers composed of protein domains would offer more varied molecular frames to introduce finer and more complex functionalities in bioreactive scaffolds using bottom-up approaches. Yet, the rules governing the three-dimensional organization of protein architectures in nature are complex and poorly understood. As a result, the synthetic fabrication of ordered protein association into polymers poses major challenges to bioengineering. We have now fabricated a self-assembling protein nanofiber with predictable morphologies and amenable to bottom-up customization, where features supporting function and assembly are spatially segregated. The design was inspired by the cross-linking of titin filaments by telethonin in the muscle sarcomere. The resulting fiber is a two-protein system that has nanopatterned peptide display capabilities as shown by the recruitment of functionalized gold nanoparticles at regular intervals of ∼ 5 nm, yielding a semiregular linear array over micrometers. This polymer promises the uncomplicated display of biologically active motifs to selectively bind and organize matter in the fine nanoscale. Further, its conceptual design has high potential for controlled plurifunctionalization.

Optical design of f-theta lens for dual wavelength selective laser melting

NASA Astrophysics Data System (ADS)

Feng, Lianhua; Cao, Hongzhong; Zhang, Ning; Xu, Xiping; Duan, Xuanming

2016-10-01

F-theta lens is an important unit for selective laser melting (SLM) manufacture. The dual wavelength f-theta lens has not been used in SLM manufacture. Here, we present the design of the f-theta lens which satisfies SLM manufacture with coaxial 532 nm and 1030 nm 1080 nm laser beams. It is composed of three pieces of spherical lenses. The focal spots for 532 nm laser and 1030 nm 1080 nm laser are smaller than 35 μm and 70 μm, respectively. The results meet the demands of high precision SLM. The chromatic aberration could cause separation between two laser focal spots in the scanning plane, so chromatic aberration correction is very important to our design. The lateral color of the designed f-theta lens is less than 11 μm within the scan area of 150 mm x 150 mm, which meet the application requirements of dual wavelength selective laser melting.

Genetic reinforcement learning through symbiotic evolution for fuzzy controller design.

PubMed

Juang, C F; Lin, J Y; Lin, C T

2000-01-01

An efficient genetic reinforcement learning algorithm for designing fuzzy controllers is proposed in this paper. The genetic algorithm (GA) adopted in this paper is based upon symbiotic evolution which, when applied to fuzzy controller design, complements the local mapping property of a fuzzy rule. Using this Symbiotic-Evolution-based Fuzzy Controller (SEFC) design method, the number of control trials, as well as consumed CPU time, are considerably reduced when compared to traditional GA-based fuzzy controller design methods and other types of genetic reinforcement learning schemes. Moreover, unlike traditional fuzzy controllers, which partition the input space into a grid, SEFC partitions the input space in a flexible way, thus creating fewer fuzzy rules. In SEFC, different types of fuzzy rules whose consequent parts are singletons, fuzzy sets, or linear equations (TSK-type fuzzy rules) are allowed. Further, the free parameters (e.g., centers and widths of membership functions) and fuzzy rules are all tuned automatically. For the TSK-type fuzzy rule especially, which put the proposed learning algorithm in use, only the significant input variables are selected to participate in the consequent of a rule. The proposed SEFC design method has been applied to different simulated control problems, including the cart-pole balancing system, a magnetic levitation system, and a water bath temperature control system. The proposed SEFC has been verified to be efficient and superior from these control problems, and from comparisons with some traditional GA-based fuzzy systems.

Primary and secondary precipitates in a hierarchical-precipitate-strengthened ferritic alloy

DOE PAGES

Song, Gian; Sun, Zhiqian; Poplawsky, Jonathan D.; ...

2017-02-27

The microstructures of a hierarchical-precipitate-strengthened ferritic alloy are characterized, using transmission-electron microscopy (TEM) and atom-probe tomography (APT). The alloy shows duplex precipitates. The primary precipitate with an average edge length of 90 nm consists of NiAl- and Ni2TiAl-type phases, while the secondary precipitate with an average radius of 2 nm is a NiAl-type phase. Based on the APT results, the volume fractions of the primary and secondary precipitates were calculated, using the lever rule to be 17.3 and 2.3 %, respectively.

Investigations of Q-switching and mode locking in diode-pumped Nd:YVO4 laser with passive saturable absorbers

NASA Astrophysics Data System (ADS)

Kwiatkowski, Jacek; Jabczynski, Jan K.; Zendzian, Waldemar

2005-03-01

The saturable absorbers (Cr4+:YAG, GaAs and LiF crystals for 1064-nm wavelength, V3+:YAG crystals for 1340-nm respectively) were examined as passive Mode Lockers and Q-switches in diode pumped Nd:YVO4 lasers in the Z-type resonators. In each case, partially modulated long trains of QML pulses were observed. As a rule, envelopes with about 1 μs duration and more than 50% depth of modulation were observed. For stabilization of the mode locking trains nonlinear crystals (KTP or LBO) as negative feedback elements were inserted. The fully modulated QML trains for intracavity II harmonic conversion at 670-nm wavelength in V3+:YAG Q-switched Nd:YVO4 laser with LBO crystal were demonstrated.

Non-polarizing beam splitter design

NASA Astrophysics Data System (ADS)

Qi, H. J.; Shao, J. D.; Hong, R. J.; Yi, K.; Fan, Z. X.

2004-09-01

In this paper a non-polarizing beam splitter design concept is presented using anisotropic thin films. Transmittance of s- and p-polarized waves can be dealt with separately. This concept can be applied to non-polarizing beam splitter designs of single wavelength and broad-band spectrum at oblique incidence. A few examples of non-polarizing beam splitters (50:50) at the design wavelength of 1064 nm and over the visible spectrum (420 nm 680 nm) are elaborated. Besides, the angular performance of these designs is examined.

The Good, the Bad, and the Ugly: A Theoretical Framework for the Assessment of Continuous Colormaps.

PubMed

Bujack, Roxana; Turton, Terece L; Samsel, Francesca; Ware, Colin; Rogers, David H; Ahrens, James

2018-01-01

A myriad of design rules for what constitutes a "good" colormap can be found in the literature. Some common rules include order, uniformity, and high discriminative power. However, the meaning of many of these terms is often ambiguous or open to interpretation. At times, different authors may use the same term to describe different concepts or the same rule is described by varying nomenclature. These ambiguities stand in the way of collaborative work, the design of experiments to assess the characteristics of colormaps, and automated colormap generation. In this paper, we review current and historical guidelines for colormap design. We propose a specified taxonomy and provide unambiguous mathematical definitions for the most common design rules.

17 CFR 151.11 - Designated contract market and swap execution facility position limits and accountability rules.

Code of Federal Regulations, 2012 CFR

2012-04-01

... Designated contract market and swap execution facility position limits and accountability rules. (a) Spot... rules and procedures for monitoring and enforcing spot-month position limits set at levels no greater... monitoring and enforcing spot-month position limits set at levels no greater than 25 percent of estimated...

17 CFR 151.11 - Designated contract market and swap execution facility position limits and accountability rules.

Code of Federal Regulations, 2013 CFR

2013-04-01

... Designated contract market and swap execution facility position limits and accountability rules. (a) Spot... rules and procedures for monitoring and enforcing spot-month position limits set at levels no greater... monitoring and enforcing spot-month position limits set at levels no greater than 25 percent of estimated...

In-die mask registration measurement on 28nm-node and beyond

NASA Astrophysics Data System (ADS)

Chen, Shen Hung; Cheng, Yung Feng; Chen, Ming Jui

2013-09-01

As semiconductor go to smaller node, the critical dimension (CD) of process become more and more small. For lithography, RET (Resolution Enhancement Technology) applications can be used for wafer printing of smaller CD/pitch on 28nm node and beyond. SMO (Source Mask Optimization), DPT (Double Patterning Technology) and SADP (Self-Align Double Patterning) can provide lower k1 value for lithography. In another way, image placement error and overlay control also become more and more important for smaller chip size (advanced node). Mask registration (image placement error) and mask overlay are important factors to affect wafer overlay control/performance especially for DPT or SADP. In traditional method, the designed registration marks (cross type, square type) with larger CD were put into scribe-line of mask frame for registration and overlay measurement. However, these patterns are far way from real patterns. It does not show the registration of real pattern directly and is not a convincing method. In this study, the in-die (in-chip) registration measurement is introduced. We extract the dummy patterns that are close to main pattern from post-OPC (Optical Proximity Correction) gds by our desired rule and choose the patterns that distribute over whole mask uniformly. The convergence test shows 100 points measurement has a reliable result.

Critical Determinants of Uptake and Translocation of Nanoparticles by the Human Pulmonary Alveolar Epithelium

PubMed Central

2015-01-01

The ability to manipulate the size and surface properties of nanomaterials makes them a promising vector for improving drug delivery and efficacy. Inhalation is a desirable route of administration as nanomaterials preferentially deposit in the alveolar region, a large surface area for drug absorption. However, as yet, the mechanisms by which particles translocate across the alveolar epithelial layer are poorly understood. Here we show that human alveolar type I epithelial cells internalize nanoparticles, whereas alveolar type II epithelial cells do not, and that nanoparticles translocate across the epithelial monolayer but are unable to penetrate the tight junctions between cells, ruling out paracellular translocation. Furthermore, using siRNA, we demonstrate that 50 nm nanoparticles enter largely by passive diffusion and are found in the cytoplasm, whereas 100 nm nanoparticles enter primarily via clathrin- and also caveolin-mediated endocytosis and are found in endosomes. Functionalization of nanoparticles increases their uptake and enhances binding of surfactant which further promotes uptake. Thus, we demonstrate that uptake and translocation across the pulmonary epithelium is controlled by alveolar type I epithelial cells, and furthermore, we highlight a number of factors that should be considered when designing new nanomedicines in order to improve drug delivery to the lung. PMID:25360809

Self-Aligned van der Waals Heterojunction Diodes and Transistors.

PubMed

Sangwan, Vinod K; Beck, Megan E; Henning, Alex; Luo, Jiajia; Bergeron, Hadallia; Kang, Junmo; Balla, Itamar; Inbar, Hadass; Lauhon, Lincoln J; Hersam, Mark C

2018-02-14

A general self-aligned fabrication scheme is reported here for a diverse class of electronic devices based on van der Waals materials and heterojunctions. In particular, self-alignment enables the fabrication of source-gated transistors in monolayer MoS 2 with near-ideal current saturation characteristics and channel lengths down to 135 nm. Furthermore, self-alignment of van der Waals p-n heterojunction diodes achieves complete electrostatic control of both the p-type and n-type constituent semiconductors in a dual-gated geometry, resulting in gate-tunable mean and variance of antiambipolar Gaussian characteristics. Through finite-element device simulations, the operating principles of source-gated transistors and dual-gated antiambipolar devices are elucidated, thus providing design rules for additional devices that employ self-aligned geometries. For example, the versatility of this scheme is demonstrated via contact-doped MoS 2 homojunction diodes and mixed-dimensional heterojunctions based on organic semiconductors. The scalability of this approach is also shown by fabricating self-aligned short-channel transistors with subdiffraction channel lengths in the range of 150-800 nm using photolithography on large-area MoS 2 films grown by chemical vapor deposition. Overall, this self-aligned fabrication method represents an important step toward the scalable integration of van der Waals heterojunction devices into more sophisticated circuits and systems.

Effect of periodic number of [Si/Sb80Te20]x multilayer film on its laser-induced crystallization studied by coherent phonon spectroscopy

PubMed Central

2012-01-01

The periodic number dependence of the femtosecond laser-induced crystallization threshold of [Si(5nm)/Sb80Te20(5nm)]x nanocomposite multilayer films has been investigated by coherent phonon spectroscopy. Coherent optical phonon spectra show that femtosecond laser-irradiated crystallization threshold of the multilayer films relies obviously on the periodic number of the multilayer films and decreases with the increasing periodic number. The mechanism of the periodic number dependence is also studied. Possible mechanisms of reflectivity and thermal conductivity losses as well as the effect of the glass substrate are ruled out, while the remaining superlattice structure effect is ascribed to be responsible for the periodic number dependence. The sheet resistance of multilayer films versus a lattice temperature is measured and shows a similar periodic number dependence with one of the laser irradiation crystallization power threshold. In addition, the periodic number dependence of the crystallization temperature can be fitted well with an experiential formula obtained by considering coupling exchange interactions between adjacent layers in a superlattice. Those results provide us with the evidence to support our viewpoint. Our results show that the periodic number of multilayer films may become another controllable parameter in the design and parameter optimization of multilayer phase change films. PMID:23173850

Defect printability of ArF alternative phase-shift mask: a critical comparison of simulation and experiment

NASA Astrophysics Data System (ADS)

Ozawa, Ken; Komizo, Tooru; Ohnuma, Hidetoshi

2002-07-01

An alternative phase shift mask (alt-PSM) is a promising device for extending optical lithography to finer design rules. There have been few reports, however, on the mask's ability to identify phase defects. We report here an alt-PSM of a single-trench type with undercut for ArF exposure, with programmed phase defects used to evaluate defect printability by measuring aerial images with a Zeiss MSM193 measuring system. The experimental results are simulated using the TEMPEST program. First, a critical comparison of the simulation and the experiment is conducted. The actual measured topographies of quartz defects are used in the simulation. Moreover, a general simulation study on defect printability using an alt-PSM for ArF exposure is conducted. The defect dimensions, which produce critical CD errors, are determined by simulation that takes into account the full 3-dimensional structure of phase defects as well as a simplified structure. The critical dimensions of an isolated bump defect identified by the alt-PSM of a single-trench type with undercut for ArF exposure are 300 nm in bottom dimension and 74 degrees in height (phase) for the real shape, where the depth of wet-etching is 100 nm and the CD error limit is +/- 5 percent.

Defect printability of alternating phase-shift mask: a critical comparison of simulation and experiment

NASA Astrophysics Data System (ADS)

Ozawa, Ken; Komizo, Tooru; Kikuchi, Koji; Ohnuma, Hidetoshi; Kawahira, Hiroichi

2002-07-01

An alternative phase shift mask (alt-PSM) is a promising device for extending optical lithography to finer design rules. There have been few reports, however, on the mask's ability to identify phase defects. We report here an alt-PSM of a dual-trench type for KrF exposure, with programmed quartz defects used to evaluate defect printability by measuring aerial images with a Zeiss MSM100 measuring system. The experimental results are simulated using the TEMPEST program. First, a critical comparison of the simulation and the experiment is conducted. The actual measured topography of quartz defects are used in the simulation. Moreover, a general simulation study on defect printability using an alt-PSM for ArF exposure is conducted. The defect dimensions, which produce critical CD errors are determined by simulation that takes into account the full 3-dimensional structure of phase defects as well as a simplified structure. The critical dimensions of an isolated defect identified by the alt-PSM of a single-trench type for ArF exposure are 240 nm in bottom diameter and 50 degrees in height (phase) for the cylindrical shape and 240 nm in bottom diameter and 90 degrees in height (phase) for the rotating trapezoidal shape, where the CD error limit is +/- 5%.

Novel quantum well gallium arsenide-based lasers for all transmission windows in optical communication

NASA Astrophysics Data System (ADS)

Tansu, Nelson

The thesis covers the development of novel active regions for high-performance edge-emitting lasers (EEL) and vertical cavity surface-emitting lasers (VCSELs) in optical communication. Three main themes of the thesis cover the design, fabrication, and physics of the novel and alternative active regions for GaAs-based VCSELs for the three optical communications windows at wavelength regimes of 850-nm, 1300-nm, and 1500-nm, with the emphases on the 1300-nm InGaAsN QW GaAs-based active regions and on the novel design of 1500-nm GaAs-based active regions. The studies include the utilization of compressively-strained InGaAsP quantum well (QW) active regions for the 850-nm VCSELs. The research on the long-wavelength lasers covers the design, growth, temperature analysis, carrier transport, and gain analysis of the InGaAsN (lambda = 1.3 mum) quantum well lasers. The novel and original design of the GaAsSb-(In)GaAsN type-II QWs to achieve 1500--3000 nm GaAs-based active regions is discussed in detail.

Approach to design neural cryptography: a generalized architecture and a heuristic rule.

PubMed

Mu, Nankun; Liao, Xiaofeng; Huang, Tingwen

2013-06-01

Neural cryptography, a type of public key exchange protocol, is widely considered as an effective method for sharing a common secret key between two neural networks on public channels. How to design neural cryptography remains a great challenge. In this paper, in order to provide an approach to solve this challenge, a generalized network architecture and a significant heuristic rule are designed. The proposed generic framework is named as tree state classification machine (TSCM), which extends and unifies the existing structures, i.e., tree parity machine (TPM) and tree committee machine (TCM). Furthermore, we carefully study and find that the heuristic rule can improve the security of TSCM-based neural cryptography. Therefore, TSCM and the heuristic rule can guide us to designing a great deal of effective neural cryptography candidates, in which it is possible to achieve the more secure instances. Significantly, in the light of TSCM and the heuristic rule, we further expound that our designed neural cryptography outperforms TPM (the most secure model at present) on security. Finally, a series of numerical simulation experiments are provided to verify validity and applicability of our results.

Laser plasma cryogenic target on translating substrate for generation of continuously repetitive EUV and soft X-ray pulses

DOE Office of Scientific and Technical Information (OSTI.GOV)

Amano, Sho

2014-06-15

To generate continuously repetitive EUV and soft X-ray pulses with various wavelengths from laser-produced plasmas, a one-dimensionally translating substrate system with a closed He gas cryostat that can continuously supply various cryogenic targets for ∼10 Hz laser pulses has been developed. The system was successfully operated at a lowest temperature of 15 K and at a maximum up-down speed of 12 mm/s. Solid Ar, Kr, and Xe layers were formed, and their growth rates and the laser crater sizes on them were studied. By optimization of the operational parameters in accordance with our design rule, it was shown that stablemore » output power was achieved continuously from the plasma emission at frequencies of 1–10 Hz. The average soft X-ray and EUV powers obtained were 19 mW at 3.2 nm, 33 mW at 10.0 nm, and 66 mW at 10.8 nm, with 10% bandwidths, from the Ar, Kr, and Xe solid targets, respectively, with a laser power of 1 W. We will be able to achieve higher frequencies using a high beam quality laser that produces smaller craters, and can expect higher powers. Although only Ar, Kr, and Xe gases were tested in this study, the target system achieved a temperature of 15 K and can thus solidify almost all target gases, apart from H and He, and can continuously supply the solid target. The use of various target materials will enable expansion of the EUV and soft X-ray emission wavelength range.« less

Nanoscale x-ray imaging of circuit features without wafer etching.

PubMed

Deng, Junjing; Hong, Young Pyo; Chen, Si; Nashed, Youssef S G; Peterka, Tom; Levi, Anthony J F; Damoulakis, John; Saha, Sayan; Eiles, Travis; Jacobsen, Chris

2017-03-01

Modern integrated circuits (ICs) employ a myriad of materials organized at nanoscale dimensions, and certain critical tolerances must be met for them to function. To understand departures from intended functionality, it is essential to examine ICs as manufactured so as to adjust design rules, ideally in a non-destructive way so that imaged structures can be correlated with electrical performance. Electron microscopes can do this on thin regions, or on exposed surfaces, but the required processing alters or even destroys functionality. Microscopy with multi-keV x-rays provides an alternative approach with greater penetration, but the spatial resolution of x-ray imaging lenses has not allowed one to see the required detail in the latest generation of ICs. X-ray ptychography provides a way to obtain images of ICs without lens-imposed resolution limits, with past work delivering 20-40 nm resolution on thinned ICs. We describe a simple model for estimating the required exposure, and use it to estimate the future potential for this technique. Here we show for the first time that this approach can be used to image circuit detail through an unprocessed 300 μ m thick silicon wafer, with sub-20 nm detail clearly resolved after mechanical polishing to 240 μ m thickness was used to eliminate image contrast caused by Si wafer surface scratches. By using continuous x-ray scanning, massively parallel computation, and a new generation of synchrotron light sources, this should enable entire non-etched ICs to be imaged to 10 nm resolution or better while maintaining their ability to function in electrical tests.

Immersion lithography defectivity analysis at DUV inspection wavelength

NASA Astrophysics Data System (ADS)

Golan, E.; Meshulach, D.; Raccah, N.; Yeo, J. Ho.; Dassa, O.; Brandl, S.; Schwarz, C.; Pierson, B.; Montgomery, W.

2007-03-01

Significant effort has been directed in recent years towards the realization of immersion lithography at 193nm wavelength. Immersion lithography is likely a key enabling technology for the production of critical layers for 45nm and 32nm design rule (DR) devices. In spite of the significant progress in immersion lithography technology, there remain several key technology issues, with a critical issue of immersion lithography process induced defects. The benefits of the optical resolution and depth of focus, made possible by immersion lithography, are well understood. Yet, these benefits cannot come at the expense of increased defect counts and decreased production yield. Understanding the impact of the immersion lithography process parameters on wafer defects formation and defect counts, together with the ability to monitor, control and minimize the defect counts down to acceptable levels is imperative for successful introduction of immersion lithography for production of advanced DR's. In this report, we present experimental results of immersion lithography defectivity analysis focused on topcoat layer thickness parameters and resist bake temperatures. Wafers were exposed on the 1150i-α-immersion scanner and 1200B Scanner (ASML), defect inspection was performed using a DUV inspection tool (UVision TM, Applied Materials). Higher sensitivity was demonstrated at DUV through detection of small defects not detected at the visible wavelength, indicating on the potential high sensitivity benefits of DUV inspection for this layer. The analysis indicates that certain types of defects are associated with different immersion process parameters. This type of analysis at DUV wavelengths would enable the optimization of immersion lithography processes, thus enabling the qualification of immersion processes for volume production.

Nanoscale x-ray imaging of circuit features without wafer etching

DOE PAGES

Deng, Junjing; Hong, Young Pyo; Chen, Si; ...

2017-03-24

Modern integrated circuits (ICs) employ a myriad of materials organized at nanoscale dimensions, and certain critical tolerances must be met for them to function. To understand departures from intended functionality, it is essential to examine ICs as manufactured so as to adjust design rules ideally in a nondestructive way so that imaged structures can be correlated with electrical performance. Electron microscopes can do this on thin regions or on exposed surfaces, but the required processing alters or even destroys functionality. Microscopy with multi-keV x-rays provides an alternative approach with greater penetration, but the spatial resolution of x-ray imaging lenses hasmore » not allowed one to see the required detail in the latest generation of ICs. X-ray ptychography provides a way to obtain images of ICs without lens-imposed resolution limits with past work delivering 20–40-nm resolution on thinned ICs. We describe a simple model for estimating the required exposure and use it to estimate the future potential for this technique. Here we show that this approach can be used to image circuit detail through an unprocessed 300-μm-thick silicon wafer with sub-20-nm detail clearly resolved after mechanical polishing to 240-μm thickness was used to eliminate image contrast caused by Si wafer surface scratches. Here, by using continuous x-ray scanning, massively parallel computation, and a new generation of synchrotron light sources, this should enable entire nonetched ICs to be imaged to 10-nm resolution or better while maintaining their ability to function in electrical tests.« less

Nanoscale x-ray imaging of circuit features without wafer etching

NASA Astrophysics Data System (ADS)

Deng, Junjing; Hong, Young Pyo; Chen, Si; Nashed, Youssef S. G.; Peterka, Tom; Levi, Anthony J. F.; Damoulakis, John; Saha, Sayan; Eiles, Travis; Jacobsen, Chris

2017-03-01

Modern integrated circuits (ICs) employ a myriad of materials organized at nanoscale dimensions, and certain critical tolerances must be met for them to function. To understand departures from intended functionality, it is essential to examine ICs as manufactured so as to adjust design rules ideally in a nondestructive way so that imaged structures can be correlated with electrical performance. Electron microscopes can do this on thin regions or on exposed surfaces, but the required processing alters or even destroys functionality. Microscopy with multi-keV x rays provides an alternative approach with greater penetration, but the spatial resolution of x-ray imaging lenses has not allowed one to see the required detail in the latest generation of ICs. X-ray ptychography provides a way to obtain images of ICs without lens-imposed resolution limits with past work delivering 20-40-nm resolution on thinned ICs. We describe a simple model for estimating the required exposure and use it to estimate the future potential for this technique. Here we show that this approach can be used to image circuit detail through an unprocessed 300 -μ m -thick silicon wafer with sub-20-nm detail clearly resolved after mechanical polishing to 240 -μ m thickness was used to eliminate image contrast caused by Si wafer surface scratches. By using continuous x-ray scanning, massively parallel computation, and a new generation of synchrotron light sources, this should enable entire nonetched ICs to be imaged to 10-nm resolution or better while maintaining their ability to function in electrical tests.

The flash memory battle: How low can we go?

NASA Astrophysics Data System (ADS)

van Setten, Eelco; Wismans, Onno; Grim, Kees; Finders, Jo; Dusa, Mircea; Birkner, Robert; Richter, Rigo; Scherübl, Thomas

2008-03-01

With the introduction of the TWINSCAN XT:1900Gi the limit of the water based hyper-NA immersion lithography has been reached in terms of resolution. With a numerical aperture of 1.35 a single expose resolution of 36.5nm half pitch has been demonstrated. However the practical resolution limit in production will be closer to 40nm half pitch, without having to go to double patterning alike strategies. In the relentless Flash memory market the performance of the exposure tool is stretched to the limit for a competitive advantage and cost-effective product. In this paper we will present the results of an experimental study of the resolution limit of the NAND-Flash Memory Gate layer for a production-worthy process on the TWINSCAN XT:1900Gi. The entire gate layer will be qualified in terms of full wafer CD uniformity, aberration sensitivities for the different wordlines and feature-center placement errors for 38, 39, 40 and 43nm half pitch design rule. In this study we will also compare the performance of a binary intensity mask to a 6% attenuated phase shift mask and look at strategies to maximize Depth of Focus, and to desensitize the gate layer for lens aberrations and placement errors. The mask is one of the dominant contributors to the CD uniformity budget of the flash gate layer. Therefore the wafer measurements are compared to aerial image measurements of the mask using AIMSTM 45-193i to separate the mask contribution from the scanner contribution to the final imaging performance.

75 FR 58453 - Self-Regulatory Organizations; NYSE Amex LLC; Notice of Filing of a Proposed Rule Change Amending...

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76 FR 68043 - Federal Acquisition Regulation; Technical Amendments

Federal Register 2010, 2011, 2012, 2013, 2014

2011-11-02

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Optimize of shrink process with X-Y CD bias on hole pattern

NASA Astrophysics Data System (ADS)

Koike, Kyohei; Hara, Arisa; Natori, Sakurako; Yamauchi, Shohei; Yamato, Masatoshi; Oyama, Kenichi; Yaegashi, Hidetami

2017-03-01

Gridded design rules[1] is major process in configuring logic circuit used 193-immersion lithography. In the scaling of grid patterning, we can make 10nm order line and space pattern by using multiple patterning techniques such as self-aligned multiple patterning (SAMP) and litho-etch- litho-etch (LELE)[2][3][4] . On the other hand, Line cut process has some error parameters such as pattern defect, placement error, roughness and X-Y CD bias with the decreasing scale. We tried to cure hole pattern roughness to use additional process such as Line smoothing[5] . Each smoothing process showed different effect. As the result, CDx shrink amount is smaller than CDy without one additional process. In this paper, we will report the pattern controllability comparison of EUV and 193-immersion. And we will discuss optimum method about CD bias on hole pattern.

Automated mask and wafer defect classification using a novel method for generalized CD variation measurements

NASA Astrophysics Data System (ADS)

Verechagin, V.; Kris, R.; Schwarzband, I.; Milstein, A.; Cohen, B.; Shkalim, A.; Levy, S.; Price, D.; Bal, E.

2018-03-01

Over the years, mask and wafers defects dispositioning has become an increasingly challenging and time consuming task. With design rules getting smaller, OPC getting complex and scanner illumination taking on free-form shapes - the probability of a user to perform accurate and repeatable classification of defects detected by mask inspection tools into pass/fail bins is reducing. The critical challenging of mask defect metrology for small nodes ( < 30 nm) was reviewed in [1]. While Critical Dimension (CD) variation measurement is still the method of choice for determining a mask defect future impact on wafer, the high complexity of OPCs combined with high variability in pattern shapes poses a challenge for any automated CD variation measurement method. In this study, a novel approach for measurement generalization is presented. CD variation assessment performance is evaluated on multiple different complex shape patterns, and is benchmarked against an existing qualified measurement methodology.

Device and circuit-level performance of carbon nanotube field-effect transistor with benchmarking against a nano-MOSFET.

PubMed

Tan, Michael Loong Peng; Lentaris, Georgios; Amaratunga Aj, Gehan

2012-08-19

The performance of a semiconducting carbon nanotube (CNT) is assessed and tabulated for parameters against those of a metal-oxide-semiconductor field-effect transistor (MOSFET). Both CNT and MOSFET models considered agree well with the trends in the available experimental data. The results obtained show that nanotubes can significantly reduce the drain-induced barrier lowering effect and subthreshold swing in silicon channel replacement while sustaining smaller channel area at higher current density. Performance metrics of both devices such as current drive strength, current on-off ratio (Ion/Ioff), energy-delay product, and power-delay product for logic gates, namely NAND and NOR, are presented. Design rules used for carbon nanotube field-effect transistors (CNTFETs) are compatible with the 45-nm MOSFET technology. The parasitics associated with interconnects are also incorporated in the model. Interconnects can affect the propagation delay in a CNTFET. Smaller length interconnects result in higher cutoff frequency.

Surrogate-Assisted Genetic Programming With Simplified Models for Automated Design of Dispatching Rules.

PubMed

Nguyen, Su; Zhang, Mengjie; Tan, Kay Chen

2017-09-01

Automated design of dispatching rules for production systems has been an interesting research topic over the last several years. Machine learning, especially genetic programming (GP), has been a powerful approach to dealing with this design problem. However, intensive computational requirements, accuracy and interpretability are still its limitations. This paper aims at developing a new surrogate assisted GP to help improving the quality of the evolved rules without significant computational costs. The experiments have verified the effectiveness and efficiency of the proposed algorithms as compared to those in the literature. Furthermore, new simplification and visualisation approaches have also been developed to improve the interpretability of the evolved rules. These approaches have shown great potentials and proved to be a critical part of the automated design system.

75 FR 47063 - Mutual Fund Distribution Fees; Confirmations

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Design and analysis of O-S-C triple band wavelength division demultiplexer using cascaded MMI couplers

NASA Astrophysics Data System (ADS)

Chack, Devendra; Kumar, V.; Raghuwanshi, Sanjeev Kumar; Singh, Dev Prakash

2017-01-01

Compact triple O-S-C band wavelength demultiplexer, which consists of series cascaded multimode interference (MMI) couplers has been carried out in this paper. The MMI coupler has been used to drop the wavelengths of 1510 nm and 1550 nm at bar port while the wavelength 1300 nm into the cross port. Then another MMI coupler has been designed to separate the wavelength 1510 nminto one port and wavelength 1550 nm into another port. The triple wavelength demultiplexer function has been performed by choosing a suitable refractive index of the guiding region and geometrical parameters such as the width and length of MMI coupler. Numerical simulation with finite difference beam propagation method (BPM) has been utilized to design and optimize the operation of the proposed triple wavelength demultiplexer. The simulation results show that insertion losses of wavelength O, S and C, bands are 1.884 dB, 1.452 dB and 2.568 dB, respectively, with isolations for each output waveguide ranging from 10 dB to 28.72 dB. The 3-dB bandwidth of insertion loss for 1300 nm, 1510 nm and 1550 nm are 80 nm, 20 nm and 10 nm, respectively.

Complexity, Training Paradigm Design, and the Contribution of Memory Subsystems to Grammar Learning

PubMed Central

Ettlinger, Marc; Wong, Patrick C. M.

2016-01-01

Although there is variability in nonnative grammar learning outcomes, the contributions of training paradigm design and memory subsystems are not well understood. To examine this, we presented learners with an artificial grammar that formed words via simple and complex morphophonological rules. Across three experiments, we manipulated training paradigm design and measured subjects' declarative, procedural, and working memory subsystems. Experiment 1 demonstrated that passive, exposure-based training boosted learning of both simple and complex grammatical rules, relative to no training. Additionally, procedural memory correlated with simple rule learning, whereas declarative memory correlated with complex rule learning. Experiment 2 showed that presenting corrective feedback during the test phase did not improve learning. Experiment 3 revealed that structuring the order of training so that subjects are first exposed to the simple rule and then the complex improved learning. The cumulative findings shed light on the contributions of grammatical complexity, training paradigm design, and domain-general memory subsystems in determining grammar learning success. PMID:27391085

The assembly, calibration, and preliminary results from the Colorado high-resolution Echelle stellar spectrograph (CHESS)

NASA Astrophysics Data System (ADS)

Hoadley, Keri; France, Kevin; Nell, Nicholas; Kane, Robert; Schultz, Ted; Beasley, Matthew; Green, James; Kulow, Jen; Kersgaard, Eliot; Fleming, Brian

2014-07-01

The Colorado High-resolution Echelle Stellar Spectrograph (CHESS) is a far ultraviolet (FUV) rocket-borne experiment designed to study the atomic-to-molecular transitions within translucent interstellar clouds. CHESS is an objective echelle spectrograph operating at f/12.4 and resolving power of 120,000 over a band pass of 100 - 160 nm. The echelle flight grating is the product of a research and development project with LightSmyth Inc. and was coated at Goddard Space Flight Center (GSFC) with Al+LiF. It has an empirically-determined groove density of 71.67 grooves/mm. At the Center for Astrophysics and Space Astronomy (CASA) at the University of Colorado (CU), we measured the efficiencies of the peak and adjacent dispersion orders throughout the 90 - 165 nm band pass to characterize the behavior of the grating for pre-flight calibrations and to assess the scattered-light behavior. The crossdispersing grating, developed and ruled by Horiba Jobin-Yvon, is a holographically-ruled, low line density (351 grooves/mm), powered optic with a toroidal surface curvature. The CHESS cross-disperser was also coated at GSFC; Cr+Al+LiF was deposited to enhance far-UV efficiency. Results from final efficiency and reflectivity measurements of both optics are presented. We utilize a cross-strip anode microchannel plate (MCP) detector built by Sensor Sciences to achieve high resolution (25 μm spatial resolution) and data collection rates (~ 106 photons/second) over a large format (40mm round, digitized to 8k x 8k) for the first time in an astronomical sounding rocket flight. The CHESS instrument was successfully launched from White Sands Missile Range on 24 May 2014. We present pre-flight sensitivity, effective area calculations, lab spectra and calibration results, and touch on first results and post-flight calibration plans.

Optomechanical design and tolerance of a microscope objective at 121.6 nm

NASA Astrophysics Data System (ADS)

Keyes, Derek S.; Jota, Thiago S.; Gao, Weichuan; Luepke, Dakota; Densmore, Victor; Kim, Young-Sik; Kim, Gun-Hee; Milster, Thomas D.

2015-08-01

By utilizing the Hydrogen-Lyman-α (HLA) source at 121.6 nm, we hope to achieve an intrinsic resolution of 247 nm at 0.3 numerical aperture (NA) and 92 nm at 0.8 NA. The motivation for 121.6 nm microscopy is the existence of a transparent window in the air absorption spectrum at that wavelength, which allows for the sample to be in air while the microscope is in an enclosed nitrogen environment. The microscope objective consists of two reflective optics and a LiF window, and it has been designed to demonstrate diffraction limited performance over a 160μm full field at 121.6 nm. The optomechanical design consists of mechanical subcells for each optical component, precision spacers and a barrel bore, which allow for submicron control of tolerance parameters.

Simple and versatile long range swept source for optical coherence tomography applications

NASA Astrophysics Data System (ADS)

Bräuer, Bastian; Lippok, Norman; Murdoch, Stuart G.; Vanholsbeeck, Frédérique

2015-12-01

We present a versatile long coherence length swept-source laser design for optical coherence tomography applications. This design consists of a polygonal spinning mirror and an optical gain chip in a modified Littman-Metcalf cavity. A narrowband intra-cavity filter is implemented through multiple passes off a diffraction grating set at grazing incidence. The key advantage of this design is that it can be readily adapted to any wavelength regions for which broadband gain chips are available. We demonstrate this by implementing sources at 1650 nm, 1550 nm, 1310 nm and 1050 nm. In particular, we present a 1310 nm swept source laser with 24 mm coherence length, 95 nm optical bandwidth, 2 kHz maximum sweep frequency and 7.5 mW average output power. These parameters make it a suitable source for the imaging of biological samples.

Can 100Gb/s wavelengths be deployed using 10Gb/s engineering rules?

NASA Astrophysics Data System (ADS)

Saunders, Ross; Nicholl, Gary; Wollenweber, Kevin; Schmidt, Ted

2007-09-01

A key challenge set by carriers for 40Gb/s deployments was that the 40Gb/s wavelengths should be deployable over existing 10Gb/s DWDM systems, using 10Gb/s link engineering design rules. Typical 10Gb/s link engineering rules are: 1. Polarization Mode Dispersion (PMD) tolerance of 10ps (mean); 2. Chromatic Dispersion (CD) tolerance of +/-700ps/nm 3. Operation at 50GHz channel spacing, including transit through multiple cascaded [R]OADMs; 4. Optical reach up to 2,000km. By using a combination of advanced modulation formats and adaptive dispersion compensation (technologies rarely seen at 10Gb/s outside of the submarine systems space), vendors did respond to the challenge and broadly met this requirement. As we now start to explore feasible technologies for 100Gb/s optical transport, driven by 100GE port availability on core IP routers, the carrier challenge remains the same. 100Gb/s links should be deployable over existing 10Gb/s DWDM systems using 10Gb/s link engineering rules (as listed above). To meet this challenge, optical transport technology must evolve to yet another level of complexity/maturity in both modulation formats and adaptive compensation techniques. Many clues as to how this might be achieved can be gained by first studying sister telecommunications industries, e.g. satellite (QPSK, QAM, LDCP FEC codes), wireless (advanced DSP, MSK), HDTV (TCM), etc. The optical industry is not a pioneer of new ideas in modulation schemes and coding theory, we will always be followers. However, we do have the responsibility of developing the highest capacity "modems" on the planet to carry the core backbone traffic of the Internet. As such, the key to our success will be to analyze the pros and cons of advanced modulation/coding techniques and balance this with the practical limitations of high speed electronics processing speed and the challenges of real world optical layer impairments. This invited paper will present a view on what advanced technologies are likely candidates to support 100GE optical IP transport over existing 10Gb/s DWDM systems, using 10Gb/s link engineering rules.

Acquisition, representation and rule generation for procedural knowledge

NASA Technical Reports Server (NTRS)

Ortiz, Chris; Saito, Tim; Mithal, Sachin; Loftin, R. Bowen

1991-01-01

Current research into the design and continuing development of a system for the acquisition of procedural knowledge, its representation in useful forms, and proposed methods for automated C Language Integrated Production System (CLIPS) rule generation is discussed. The Task Analysis and Rule Generation Tool (TARGET) is intended to permit experts, individually or collectively, to visually describe and refine procedural tasks. The system is designed to represent the acquired knowledge in the form of graphical objects with the capacity for generating production rules in CLIPS. The generated rules can then be integrated into applications such as NASA's Intelligent Computer Aided Training (ICAT) architecture. Also described are proposed methods for use in translating the graphical and intermediate knowledge representations into CLIPS rules.

Verifying Architectural Design Rules of the Flight Software Product Line

NASA Technical Reports Server (NTRS)

Ganesan, Dharmalingam; Lindvall, Mikael; Ackermann, Chris; McComas, David; Bartholomew, Maureen

2009-01-01

This paper presents experiences of verifying architectural design rules of the NASA Core Flight Software (CFS) product line implementation. The goal of the verification is to check whether the implementation is consistent with the CFS architectural rules derived from the developer's guide. The results indicate that consistency checking helps a) identifying architecturally significant deviations that were eluded during code reviews, b) clarifying the design rules to the team, and c) assessing the overall implementation quality. Furthermore, it helps connecting business goals to architectural principles, and to the implementation. This paper is the first step in the definition of a method for analyzing and evaluating product line implementations from an architecture-centric perspective.

Process Materialization Using Templates and Rules to Design Flexible Process Models

NASA Astrophysics Data System (ADS)

Kumar, Akhil; Yao, Wen

The main idea in this paper is to show how flexible processes can be designed by combining generic process templates and business rules. We instantiate a process by applying rules to specific case data, and running a materialization algorithm. The customized process instance is then executed in an existing workflow engine. We present an architecture and also give an algorithm for process materialization. The rules are written in a logic-based language like Prolog. Our focus is on capturing deeper process knowledge and achieving a holistic approach to robust process design that encompasses control flow, resources and data, as well as makes it easier to accommodate changes to business policy.

77 FR 28919 - Self-Regulatory Organizations; NYSE Arca, Inc.; Order Approving a Proposed Rule Change To Amend...

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2012-05-16

... be made in a nondiscriminatory fashion.\\14\\ \\14\\ See NYSE Arca Equities Rule 7.45(d)(3). NYSE Arca... Securities will be required to establish and enforce policies and procedures that are reasonably designed to... other things, that the rules of a national securities exchange be designed to prevent fraudulent and...

77 FR 38116 - Self-Regulatory Organizations; NYSE Arca, Inc.; Notice of Designation of a Longer Period for...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-06-26

...-Regulatory Organizations; NYSE Arca, Inc.; Notice of Designation of a Longer Period for Commission Action on Proposed Rule Change Proposing a Pilot Program To Create a Lead Market Maker Issuer Incentive Program for...'') \\1\\ and Rule 19b-4 thereunder,\\2\\ a proposed rule change to create and implement, on a pilot basis, a...

Learning CAD at University through Summaries of the Rules of Design Intent

ERIC Educational Resources Information Center

Barbero, Basilio Ramos; Pedrosa, Carlos Melgosa; Samperio, Raúl Zamora

2017-01-01

The ease with which 3D CAD models may be modified and reused are two key aspects that improve the design-intent variable and that can significantly shorten the development timelines of a product. A set of rules are gathered from various authors that take different 3D modelling strategies into account. These rules are then applied to CAD…

Basis of the tubesheet heat exchanger design rules used in the French pressure vessel code

DOE Office of Scientific and Technical Information (OSTI.GOV)

Osweiller, F.

1992-02-01

For about 40 years most tubessheet exchangers have been designed according to the standards of TEMA. Partly due to their simplicity, these rules do not assure a safe heat-exchanger design in all cases. This is the main reason why new tubesheet design rules were developed in 1981 in France for the French pressure vessel code CODAP. For fixed tubesheet heat exchangers, the new rules account for the elastic rotational restraint of the shell and channel at the outer edge of the tubesheet, as proposed in 1959 by Galletly. For floating-head and U-tube heat exchangers, the approach developed by Gardner inmore » 1969 was selected with some modifications. In both cases, the tubesheet is replaced by an equivalent solid plate with adequate effective elastic constants, and the tube bundle is simulated by an elastic foundation. The elastic restraint at the edge of the tubesheet due the shell and channel is accounted for in different ways in the two types of heat exchangers. The purpose of the paper is to present the main basis of these rules and to compare them to TEMA rules.« less

Reflective Filters Design for Self-Filtering Narrowband Ultraviolet Imaging Experiment Wide-Field Surveys (NUVIEWS) Project

NASA Technical Reports Server (NTRS)

Park, Jung- Ho; Kim, Jongmin; Zukic, Muamer; Torr, Douglas G.

1994-01-01

We report the design of multilayer reflective filters for the self-filtering cameras of the NUVIEWS project. Wide angle self-filtering cameras were designed to image the C IV (154.9 nm) line emission, and H2 Lyman band fluorescence (centered at 161 nm) over a 20 deg x 30 deg field of view. A key element of the filter design includes the development of pi-multilayers optimized to provide maximum reflectance at 154.9 nm and 161 nm for the respective cameras without significant spectral sensitivity to the large cone angle of the incident radiation. We applied self-filtering concepts to design NUVIEWS telescope filters that are composed of three reflective mirrors and one folding mirror. The filters with narrowband widths of 6 and 8 rim at 154.9 and 161 nm, respectively, have net throughputs of more than 50 % with average blocking of out-of-band wavelengths better than 3 x 10(exp -4)%.

77 FR 71658 - Self-Regulatory Organizations; New York Stock Exchange LLC; Notice of Filing and Immediate...

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2012-12-03

... Proposed Rule Change Moving the Rule Text That Provides for Pegging on the Exchange From Supplementary Material .26 of NYSE Rule 70 to NYSE Rule 13 and Amending Such Text to (i) Permit Designated Market Maker... of the Terms of Substance of the Proposed Rule Change The Exchange proposes to move the rule text...

META II Complex Systems Design and Analysis (CODA)

DTIC Science & Technology

2011-08-01

37  3.8.7  Variables, Parameters and Constraints ............................................................. 37  3.8.8  Objective...18  Figure 7: Inputs, States, Outputs and Parameters of System Requirements Specifications ......... 19...Design Rule Based on Device Parameter ....................................................... 57  Figure 35: AEE Device Design Rules (excerpt

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... Proposed Rule Change To Modify the Requirements To Qualify for Credits as a Designated Liquidity Provider... requirements to qualify for credits as a designated liquidity provider under Rule 7018(i) and to make a minor... Designated Liquidity Providers: Charge to Designated Liquidity Provider $0.003 per share executed entering...

75 FR 52860 - Final Airworthiness Design Standards for Acceptance Under the Primary Category Rule; Orlando...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-08-30

...., wish to apply these airworthiness design standards to other airplane models, OHA, Inc. must submit a... affects only certain airworthiness design standards on Cessna model C172I, C172K, C172L, C172M airplanes... Design Standards for Acceptance Under the Primary Category Rule; Orlando Helicopter Airways (OHA), Inc...

Low cost and high performance GPON, GEPON and RFoG optical network pentaplexer module design using diffractive grating approach

NASA Astrophysics Data System (ADS)

Chen, I.-Ju; Chi, Chang-Chia; Tarn, Chen-Wen

2016-01-01

A new architecture of a pentaplexer transceiver module which can be used in GPON/GEPON and RFoG triple play optical networks with supporting of the multiple optical wavelengths of 1310 nm, 1490 nm, 1550 nm, 1610 nm, and 1650 nm, is proposed. By using diffractive grating elements combing with market readily available GRIN (Gradient-Index) lens, grating, mirrors, beamsplitter, LDs (Laser Diodes), and PDs (Photodetectors), the proposed design have the advantages of low cost, high efficiency/performance, easy design and manufacturing, over the contemporary triplex transceivers which are made of multilayer filters or waveguides that increase the complexity of manufacturing and reduce the performance efficiency. With the proposed design, a pentaplexer system can accommodate GPON/GEPON, RFoG, and monitoring integration services, total five optical wavelength channels into a hybrid-integrated TO-CAN package platform with sufficient efficiency.

Design of a patterned nanostructure array using a nanosecond pulsed laser

NASA Astrophysics Data System (ADS)

Yoshida, Yutaka; Ohnishi, Ko; Matsuo, Yasutaka; Watanabe, Seiichi

2018-04-01

For design the patterned nanostructure array (PNSA) on material surface using a nanosecond pulsed laser, we investigated the influence of phase shift between scattered lights on silicon (Si) substrate using 30-nm-wide gold lines (GLs) spacings. At a spacing of 5,871 nm, ten nanodot (ND) arrays were formed at intervals of 533 nm by nanosecond pulsed laser. The results show that the formation of the PNSA was affected by the resonance of scattered light. We conclude that ND arrays were formed with a spacing of Λ = nλ. And we have designed PNSA comprising two ND arrays on the substrate. The PNSA with dimensions of 1,600 nm × 1,600 nm was prepared using GLs.

Bendability optimization of flexible optical nanoelectronics via neutral axis engineering

PubMed Central

2012-01-01

The enhancement of bendability of flexible nanoelectronics is critically important to realize future portable and wearable nanoelectronics for personal and military purposes. Because there is an enormous variety of materials and structures that are used for flexible nanoelectronic devices, a governing design rule for optimizing the bendability of these nanodevices is required. In this article, we suggest a design rule to optimize the bendability of flexible nanoelectronics through neutral axis (NA) engineering. In flexible optical nanoelectronics, transparent electrodes such as indium tin oxide (ITO) are usually the most fragile under an external load because of their brittleness. Therefore, we representatively focus on the bendability of ITO which has been widely used as transparent electrodes, and the NA is controlled by employing a buffer layer on the ITO layer. First, we independently investigate the effect of the thickness and elastic modulus of a buffer layer on the bendability of an ITO film. Then, we develop a design rule for the bendability optimization of flexible optical nanoelectronics. Because NA is determined by considering both the thickness and elastic modulus of a buffer layer, the design rule is conceived to be applicable regardless of the material and thickness that are used for the buffer layer. Finally, our design rule is applied to optimize the bendability of an organic solar cell, which allows the bending radius to reach about 1 mm. Our design rule is thus expected to provide a great strategy to enhance the bending performance of a variety of flexible nanoelectronics. PMID:22587757

Bendability optimization of flexible optical nanoelectronics via neutral axis engineering.

PubMed

Lee, Sangmin; Kwon, Jang-Yeon; Yoon, Daesung; Cho, Handong; You, Jinho; Kang, Yong Tae; Choi, Dukhyun; Hwang, Woonbong

2012-05-15

The enhancement of bendability of flexible nanoelectronics is critically important to realize future portable and wearable nanoelectronics for personal and military purposes. Because there is an enormous variety of materials and structures that are used for flexible nanoelectronic devices, a governing design rule for optimizing the bendability of these nanodevices is required. In this article, we suggest a design rule to optimize the bendability of flexible nanoelectronics through neutral axis (NA) engineering. In flexible optical nanoelectronics, transparent electrodes such as indium tin oxide (ITO) are usually the most fragile under an external load because of their brittleness. Therefore, we representatively focus on the bendability of ITO which has been widely used as transparent electrodes, and the NA is controlled by employing a buffer layer on the ITO layer. First, we independently investigate the effect of the thickness and elastic modulus of a buffer layer on the bendability of an ITO film. Then, we develop a design rule for the bendability optimization of flexible optical nanoelectronics. Because NA is determined by considering both the thickness and elastic modulus of a buffer layer, the design rule is conceived to be applicable regardless of the material and thickness that are used for the buffer layer. Finally, our design rule is applied to optimize the bendability of an organic solar cell, which allows the bending radius to reach about 1 mm. Our design rule is thus expected to provide a great strategy to enhance the bending performance of a variety of flexible nanoelectronics.

78 FR 62784 - Self-Regulatory Organizations; Financial Industry Regulatory Authority, Inc.; Notice of...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-10-22

...-Regulatory Organizations; Financial Industry Regulatory Authority, Inc.; Notice of Designation of a Longer Period for Commission Action on a Proposed Rule Change Relating to Wash Sale Transactions and FINRA Rule...-4 thereunder,\\2\\ a proposed rule change to amend FINRA Rule 5210. The proposed rule change was...

14 CFR 93.121 - Applicability.

Code of Federal Regulations, 2010 CFR

2010-01-01

... AND GENERAL OPERATING RULES SPECIAL AIR TRAFFIC RULES High Density Traffic Airports § 93.121 Applicability. This subpart designates high density traffic airports and prescribes air traffic rules for...

14 CFR 93.121 - Applicability.

Code of Federal Regulations, 2012 CFR

2012-01-01

... AND GENERAL OPERATING RULES SPECIAL AIR TRAFFIC RULES High Density Traffic Airports § 93.121 Applicability. This subpart designates high density traffic airports and prescribes air traffic rules for...

14 CFR 93.121 - Applicability.

Code of Federal Regulations, 2014 CFR

2014-01-01

... AND GENERAL OPERATING RULES SPECIAL AIR TRAFFIC RULES High Density Traffic Airports § 93.121 Applicability. This subpart designates high density traffic airports and prescribes air traffic rules for...

14 CFR 93.121 - Applicability.

Code of Federal Regulations, 2011 CFR

2011-01-01

... AND GENERAL OPERATING RULES SPECIAL AIR TRAFFIC RULES High Density Traffic Airports § 93.121 Applicability. This subpart designates high density traffic airports and prescribes air traffic rules for...

14 CFR 93.121 - Applicability.

Code of Federal Regulations, 2013 CFR

2013-01-01

... AND GENERAL OPERATING RULES SPECIAL AIR TRAFFIC RULES High Density Traffic Airports § 93.121 Applicability. This subpart designates high density traffic airports and prescribes air traffic rules for...

Hyper-heuristic Evolution of Dispatching Rules: A Comparison of Rule Representations.

PubMed

Branke, Jürgen; Hildebrandt, Torsten; Scholz-Reiter, Bernd

2015-01-01

Dispatching rules are frequently used for real-time, online scheduling in complex manufacturing systems. Design of such rules is usually done by experts in a time consuming trial-and-error process. Recently, evolutionary algorithms have been proposed to automate the design process. There are several possibilities to represent rules for this hyper-heuristic search. Because the representation determines the search neighborhood and the complexity of the rules that can be evolved, a suitable choice of representation is key for a successful evolutionary algorithm. In this paper we empirically compare three different representations, both numeric and symbolic, for automated rule design: A linear combination of attributes, a representation based on artificial neural networks, and a tree representation. Using appropriate evolutionary algorithms (CMA-ES for the neural network and linear representations, genetic programming for the tree representation), we empirically investigate the suitability of each representation in a dynamic stochastic job shop scenario. We also examine the robustness of the evolved dispatching rules against variations in the underlying job shop scenario, and visualize what the rules do, in order to get an intuitive understanding of their inner workings. Results indicate that the tree representation using an improved version of genetic programming gives the best results if many candidate rules can be evaluated, closely followed by the neural network representation that already leads to good results for small to moderate computational budgets. The linear representation is found to be competitive only for extremely small computational budgets.

78 FR 67467 - Registration of Municipal Advisors

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2013-11-12

... the Exchange Act. These rules and forms are designed to give effect to provisions of Title IX of the... ``investment strategies'' in the final rule is designed to address the main concerns raised by these commenters... state, and provide tax advantages designed to encourage saving for future college costs.\\54\\ 529 Savings...

Weather Avoidance Guidelines for NASA Global Hawk High-Altitude UAS

NASA Technical Reports Server (NTRS)

Cecil, Daniel J.; Zipser, Edward J.; Velden, Chris; Monette, Sarah; Heymsfield, Gerry; Braun, Scott; Newman, Paul; Black, Pete; Black, Michael; Dunion, Jason

2014-01-01

NASA operates two Global Hawk unmanned aircraft systems for Earth Science research projects. In particular, they are used in the Hurricane and Severe Storm Sentinel (HS3) project during 2012, 2013, and 2014 to take measurements from the environment around tropical cyclones, and from directly above tropical cyclones. There is concern that strict adherence to the weather avoidance rules used in 2012 may sacrifice the ability to observe important science targets. We have proposed modifications to these weather avoidance rules that we believe will improve the ability to observe science targets without compromising aircraft safety. The previous guidelines, used in 2012, specified: Do not approach thunderstorms within 25 nm during flight at FL500 or below. When flying above FL500: Do not approach reported lightning within 25NM in areas where cloud tops are reported at FL500 or higher. Aircraft should maintain at least 10000 ft vertical separation from reported lightning if cloud tops are below FL500. No over-flight of cumulus tops higher than FL500. No flight into forecast or reported icing conditions. No flight into forecast or reported moderate or severe turbulence Based on past experience with high-altitude flights over tropical cyclones, we have recommended changing this guidance to: Do not approach thunderstorms within 25 nm during flight at FL500 or below. Aircraft should maintain at least 5000 ft vertical separation from significant convective cloud tops except: a) When cloud tops above FL500: In the event of reported significant lightning activity or indicators of significant overshooting tops, do not approach within 10-25 nm, depending on pilot discretion and advice from Mission Scientist. b) When cloud tops are below FL500, maintain 10000 ft separation from reported significant lightning or indicators of significant overshooting tops. No flight into forecasted or reported icing conditions. No flight into forecasted or reported moderate or severe turbulence The key changes have to do with overflight of high convective cloud tops and those producing lightning. Experience shows that most tropical oceanic convection (including that in tropical cyclones) is relatively gentle even if the cloud tops are quite high, and can be safely overflown. Exceptions are convective elements producing elevated lightning flash rates (more than just the occasional flash, which would trigger avoidance under the previous rules) and significant overshooting cloud tops.

78 FR 18377 - Self-Regulatory Organizations; National Stock Exchange, Inc.; Notice of Designation of a Longer...

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2013-03-26

... Organizations; National Stock Exchange, Inc.; Notice of Designation of a Longer Period for Commission Action on Proposed Rule Change To Adopt a New Order Type Called the ``Auto-Ex Only'' Order March 19, 2013. On January... (``Act'') \\1\\ and Rule 19b-4 thereunder,\\2\\ a proposed rule change to adopt a new order type called the...

Sandia National Laboratories Facilities Management and Operations Center Design Standards Manual

DOE Office of Scientific and Technical Information (OSTI.GOV)

Peterson, Timothy L.

2014-09-01

At Sandia National Laboratories in New Mexico (SNL/NM), the design, construction, operation, and maintenance of facilities is guided by industry standards, a graded approach, and the systematic analysis of life cycle benefits received for costs incurred. The design of the physical plant must ensure that the facilities are "fit for use," and provide conditions that effectively, efficiently, and safely support current and future mission needs. In addition, SNL/NM applies sustainable design principles, using an integrated whole-building design approach, from site planning to facility design, construction, and operation to ensure building resource efficiency and the health and productivity of occupants. Themore » safety and health of the workforce and the public, any possible effects on the environment, and compliance with building codes take precedence over project issues, such as performance, cost, and schedule. These design standards generally apply to all disciplines on all SNL/NM projects. Architectural and engineering design must be both functional and cost-effective. Facility design must be tailored to fit its intended function, while emphasizing low-maintenance, energy-efficient, and energy-conscious design. Design facilities that can be maintained easily, with readily accessible equipment areas, low maintenance, and quality systems. To promote an orderly and efficient appearance, architectural features of new facilities must complement and enhance the existing architecture at the site. As an Architectural and Engineering (A/E) professional, you must advise the Project Manager when this approach is prohibitively expensive. You are encouraged to use professional judgment and ingenuity to produce a coordinated interdisciplinary design that is cost-effective, easily contractible or buildable, high-performing, aesthetically pleasing, and compliant with applicable building codes. Close coordination and development of civil, landscape, structural, architectural, fire protection, mechanical, electrical, telecommunications, and security features is expected to ensure compatibility with planned functional equipment and to facilitate constructability. If portions of the design are subcontracted to specialists, delivery of the finished design documents must not be considered complete until the subcontracted portions are also submitted for review. You must, along with support consultants, perform functional analyses and programming in developing design solutions. These solutions must reflect coordination of the competing functional, budgetary, and physical requirements for the project. During design phases, meetings between you and the SNL/NM Project Team to discuss and resolve design issues are required. These meetings are a normal part of the design process. For specific design-review requirements, see the project-specific Design Criteria. In addition to the design requirements described in this manual, instructive information is provided to explain the sustainable building practice goals for design, construction, operation, and maintenance of SNL/NM facilities. Please notify SNL/NM personnel of design best practices not included in this manual, so they can be incorporated in future updates. You must convey all documents describing work to the SNL/NM Project Manager in both hard copy and in an electronic format compatible with the SNL/NM-prescribed CADD and other software packages, and in accordance with a SNL/NM approved standard format. Print all hard copy versions of submitted documents (excluding drawings and renderings) double-sided when practical.« less

Effect of reproductive methods and GnRH administration on long-term protocol in Santa Ines ewes.

PubMed

Biehl, Marcos V; Ferraz Junior, Marcos V C; Ferreira, Evandro M; Polizel, Daniel M; Miszura, Alexandre A; Barroso, José P R; Oliveira, Gabriela B; Bertoloni, Analisa V; Pires, Alexandre V

2017-08-01

This study aimed to determine whether reproductive performance of ewes submitted to laparoscopic timed artificial insemination (TAI) would be similar to ante meridiem (AM)/post meridiem (PM) rule and assisted natural mating (NM), and whether GnRH may enhance the pregnancy rate in TAI. In experiment I, 191 non-lactating ewes were synchronized, then TAI was performed either 48 h after progesterone (P4) removal (TAI-48 h) or 12 h after estrus detection (AM/PM); moreover, some ewes were submitted to NM (NM) as control treatment. In experiment II, 247 non-lactating ewes were allocated in five treatments, a control (no-GnRH on protocol) and four treatments arranged in a factorial design 2 × 2. The factors were time and dose of GnRH: ewes that received either 10 μg (TAI-10 μg-36 h) or 25 μg of GnRH (TAI-25 μg-36 h) 36 h after P4 removal and ewes that received either 10 μg (TAI-10 μg-48 h) or 25 μg of GnRH (TAI-25 μg-48 h) at time of insemination, 48 h after P4 removal. In experiment I, pregnancy rate in TAI-48 h was lower (P = 0.03) than AM/PM and NM. Moreover, the probability of pregnancy in TAI-48 h was higher (P = 0.06) in ewes detected in estrus early. In experiment II, the use of GnRH in TAI protocols increased (P < 0.01) pregnancy rate at synchronization, and TAI-25 μ-48 h and TAI-10 μg-36 h treatments increased (P = 0.02) pregnancy rate compered to TAI-10 μg-48 h. We conclude that TAI decreased pregnancy rate compered to NM and AM/PM, which may be improved by GnRH use in TAI to synchronize ovulation.

75 FR 58455 - Self-Regulatory Organizations; New York Stock Exchange LLC; Notice of Filing of a Proposed Rule...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-09-24

... Rule 104 To Adopt Pricing Obligations for Designated Market Makers September 20, 2010. Pursuant to... of the Proposed Rule Change The Exchange proposes to amend Rule 104 to adopt pricing obligations for.... Purpose The Exchange proposes to amend Rule 104 to adopt pricing obligations for DMMs. Under the proposal...

Influence of 2D electrostatic effects on the high-frequency noise behavior of sub-100-nm scaled MOSFETs

NASA Astrophysics Data System (ADS)

Rengel, Raul; Pardo, Daniel; Martin, Maria J.

2004-05-01

In this work, we have performed an investigation of the consequences of dowscaling the bulk MOSFET beyond the 100 nm range by means of a particle-based Monte Carlo simulator. Taking a 250 nm gate-length ideal structure as the starting point, the constant field scaling rules (also known as "classical" scaling) are considered and the high-frequency dynamic and noise performance of transistors with 130 nm, 90 nm and 60 nm gate-lengths are studied in depth. The analysis of internal quantities such as electric fields, velocity and energy of carriers or conduction band profiles shows the increasing importance of electrostatic two-dimensional effects due to the proximity of source and drain regions even when the most ideal bias conditions are imposed. As a consequence, a loss of the transistor action for the smallest MOSFET and the degradation of the most important high-frequency figures of merit is observed. Whereas the comparative values of intrinsic noise sources (SID, SIG) are improved when reducing the dimensions and the bias voltages, the poor dynamic performance yields an overall worse noise behaviour than expected (especially for Rn and Gass), limiting at the same time the useful bias ranges and conditions for a proper low-noise configuration.

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2013-12-27

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77 FR 21161 - National Forest System Land Management Planning

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2012-04-09

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2013-08-21

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Optimal Test Design with Rule-Based Item Generation

ERIC Educational Resources Information Center

Geerlings, Hanneke; van der Linden, Wim J.; Glas, Cees A. W.

2013-01-01

Optimal test-design methods are applied to rule-based item generation. Three different cases of automated test design are presented: (a) test assembly from a pool of pregenerated, calibrated items; (b) test generation on the fly from a pool of calibrated item families; and (c) test generation on the fly directly from calibrated features defining…

Design space exploration for early identification of yield limiting patterns

NASA Astrophysics Data System (ADS)

Li, Helen; Zou, Elain; Lee, Robben; Hong, Sid; Liu, Square; Wang, JinYan; Du, Chunshan; Zhang, Recco; Madkour, Kareem; Ali, Hussein; Hsu, Danny; Kabeel, Aliaa; ElManhawy, Wael; Kwan, Joe

2016-03-01

In order to resolve the causality dilemma of which comes first, accurate design rules or real designs, this paper presents a flow for exploration of the layout design space to early identify problematic patterns that will negatively affect the yield. A new random layout generating method called Layout Schema Generator (LSG) is reported in this paper, this method generates realistic design-like layouts without any design rule violation. Lithography simulation is then used on the generated layout to discover the potentially problematic patterns (hotspots). These hotspot patterns are further explored by randomly inducing feature and context variations to these identified hotspots through a flow called Hotspot variation Flow (HSV). Simulation is then performed on these expanded set of layout clips to further identify more problematic patterns. These patterns are then classified into design forbidden patterns that should be included in the design rule checker and legal patterns that need better handling in the RET recipes and processes.

Failure detection system design methodology. Ph.D. Thesis

NASA Technical Reports Server (NTRS)

Chow, E. Y.

1980-01-01

The design of a failure detection and identification system consists of designing a robust residual generation process and a high performance decision making process. The design of these two processes are examined separately. Residual generation is based on analytical redundancy. Redundancy relations that are insensitive to modelling errors and noise effects are important for designing robust residual generation processes. The characterization of the concept of analytical redundancy in terms of a generalized parity space provides a framework in which a systematic approach to the determination of robust redundancy relations are developed. The Bayesian approach is adopted for the design of high performance decision processes. The FDI decision problem is formulated as a Bayes sequential decision problem. Since the optimal decision rule is incomputable, a methodology for designing suboptimal rules is proposed. A numerical algorithm is developed to facilitate the design and performance evaluation of suboptimal rules.

Atomic clusters and atomic surfaces in icosahedral quasicrystals.

PubMed

Quiquandon, Marianne; Portier, Richard; Gratias, Denis

2014-05-01

This paper presents the basic tools commonly used to describe the atomic structures of quasicrystals with a specific focus on the icosahedral phases. After a brief recall of the main properties of quasiperiodic objects, two simple physical rules are discussed that lead one to eventually obtain a surprisingly small number of atomic structures as ideal quasiperiodic models for real quasicrystals. This is due to the fact that the atomic surfaces (ASs) used to describe all known icosahedral phases are located on high-symmetry special points in six-dimensional space. The first rule is maximizing the density using simple polyhedral ASs that leads to two possible sets of ASs according to the value of the six-dimensional lattice parameter A between 0.63 and 0.79 nm. The second rule is maximizing the number of complete orbits of high symmetry to construct as large as possible atomic clusters similar to those observed in complex intermetallic structures and approximant phases. The practical use of these two rules together is demonstrated on two typical examples of icosahedral phases, i-AlMnSi and i-CdRE (RE = Gd, Ho, Tm).

Absolute S- and P-plane polarization efficiencies for high frequency holographic gratings in the VUV

NASA Technical Reports Server (NTRS)

Caruso, A. J.; Woodgate, B. E.; Mount, G. H.

1981-01-01

High frequency plane gratings (3500 and 3600 gr/mm) have been holographically ruled and blazed for the VUV spectral region. All gratings were coated with 70 nm Al + 25 nm MgF2. Absolute unpolarized and S- and P-plane polarization efficiencies have been measured for the first and second orders in the 120- to 450-nm spectral region at 18.5 and 30 deg angles of deviation. For deep grooves, anomalous features are more pronounced for the P-plane polarization efficiency than for the S-plane polarization efficiency. Holographic gratings can be tailored to produce high polarization or low polarization in the VUV. For comparison, efficiencies and polarization of the best conventional high frequency gratings were also determined. Measurements show that scattered light is significantly lower for holographic gratings in the VUV when compared with the conventional gratings.

77 FR 71853 - Self-Regulatory Organizations; NYSE MKT LLC; Notice of Filing and Immediate Effectiveness of...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-12-04

... Moving the Rule Text That Provides for Pegging on the Exchange From Supplementary Material .26 of Rule 70--Equities to Rule 13--Equities and Amending Such Text to (i) Permit Designated Market Maker Interest To Be... Proposed Rule Change The Exchange proposes to move the rule text that provides for pegging on the Exchange...

77 FR 39547 - Self-Regulatory Organizations; NYSE Amex LLC; Notice of Designation of a Longer Period for...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-07-03

... Proposed Rule Change Amending Commentary .07 to NYSE Amex Options Rule 904 To Eliminate Position Limits for... Act of 1934 (the ``Act'') \\2\\ and Rule 19b-4 thereunder,\\3\\ a proposed rule change to eliminate... side of the market. The proposal would amend Commentary .07 to NYSE Amex Options Rule 904 to eliminate...

18 CFR 385.1403 - Petitions seeking institution of rulemaking proceedings (Rule 1404).

Code of Federal Regulations, 2010 CFR

2010-04-01

... PROCEDURE Oil Pipeline Proceedings § 385.1403 Petitions seeking institution of rulemaking proceedings (Rule... purpose of issuing statements, rules, or regulations of general applicability and significance designed to...

Direct Final Rule for Technical Amendments for Marine Spark-Ignition Engines and Vessels

EPA Pesticide Factsheets

Rule published September 16, 2010 to make technical amendments to the design standard for portable marine fuel tanks. This rule incorporates safe recommended practices, developed through industry consensus.

Free-form machining for micro-imaging systems

NASA Astrophysics Data System (ADS)

Barkman, Michael L.; Dutterer, Brian S.; Davies, Matthew A.; Suleski, Thomas J.

2008-02-01

While mechanical ruling and single point diamond turning has been a mainstay of optical fabrication for many years, many types of micro-optical devices and structures are not conducive to simple diamond turning or ruling, such as, for example, microlens arrays, and optical surfaces with non-radial symmetry. More recent developments in machining technology have enabled significant expansion of fabrication capabilities. Modern machine tools can generate complex three-dimensional structures with optical quality surface finish, and fabricate structures across a dynamic range of dimensions not achievable with lithographic techniques. In particular, five-axis free-form micromachining offers a great deal of promise for realization of essentially arbitrary surface structures, including surfaces not realizable through binary or analog lithographic techniques. Furthermore, these machines can generate geometric features with optical finish on scales ranging from centimeters to micrometers with accuracies of 10s of nanometers. In this paper, we discuss techniques and applications of free-form surface machining of micro-optical elements. Aspects of diamond machine tool design to realize desired surface geometries in specific materials are discussed. Examples are presented, including fabrication of aspheric lens arrays in germanium for compact infrared imaging systems. Using special custom kinematic mounting equipment and the additional axes of the machine, the lenses were turned with surface finish better than 2 nm RMS and center to center positioning accuracy of +/-0.5 μm.

Railway Online Booking System Design and Implementation

NASA Astrophysics Data System (ADS)

Zongjiang, Wang

In this paper, we define rule usefulness and introduce one approach to evaluate the rule usefulness in rough sets. And we raise one method to get most useful rules. This method is easy and effective in applications of prisoners' reform. Comparing with the method to get most interesting rules, ours is direct and objective. Rule interestingness must consider the predefined knowledge on what kind of information is interesting. Our method greatly reduces the rule numbers generated and provides a measure of rule usefulness at the same time.

Rule-based navigation control design for autonomous flight

NASA Astrophysics Data System (ADS)

Contreras, Hugo; Bassi, Danilo

2008-04-01

This article depicts a navigation control system design that is based on a set of rules in order to follow a desired trajectory. The full control of the aircraft considered here comprises: a low level stability control loop, based on classic PID controller and the higher level navigation whose main job is to exercise lateral control (course) and altitude control, trying to follow a desired trajectory. The rules and PID gains were adjusted systematically according to the result of flight simulation. In spite of its simplicity, the rule-based navigation control proved to be robust, even with big perturbation, like crossing winds.

Printing Smart Designs of Light Emitting Devices with Maintained Textile Properties.

PubMed

Verboven, Inge; Stryckers, Jeroen; Mecnika, Viktorija; Vandevenne, Glen; Jose, Manoj; Deferme, Wim

2018-02-13

To maintain typical textile properties, smart designs of light emitting devices are printed directly onto textile substrates. A first approach shows improved designs for alternating current powder electroluminescence (ACPEL) devices. A configuration with the following build-up, starting from the textile substrate, was applied using the screen printing technique: silver (10 µm)/barium titanate (10 µm)/zinc-oxide (10 µm) and poly(3,4-ethylenedioxythiophene)poly(styrenesulfonate) (10 µm). Textile properties such as flexibility, drapability and air permeability are preserved by implementing a pixel-like design of the printed layers. Another route is the application of organic light emitting devices (OLEDs) fabricated out of following layers, also starting from the textile substrate: polyurethane or acrylate (10-20 µm) as smoothing layer/silver (200 nm)/poly(3,4-ethylenedioxythiophene)poly(styrenesulfonate) (35 nm)/super yellow (80 nm)/calcium/aluminum (12/17 nm). Their very thin nm-range layer thickness, preserving the flexibility and drapability of the substrate, and their low working voltage, makes these devices the possible future in light-emitting wearables.

Improving the CD linearity and proximity performance of photomasks written on the Sigma7500-II DUV laser writer through embedded OPC

NASA Astrophysics Data System (ADS)

Österberg, Anders; Ivansen, Lars; Beyerl, Angela; Newman, Tom; Bowhill, Amanda; Sahouria, Emile; Schulze, Steffen

2007-10-01

Optical proximity correction (OPC) is widely used in wafer lithography to produce a printed image that best matches the design intent while optimizing CD control. OPC software applies corrections to the mask pattern data, but in general it does not compensate for the mask writer and mask process characteristics. The Sigma7500-II deep-UV laser mask writer projects the image of a programmable spatial light modulator (SLM) using partially coherent optics similar to wafer steppers, and the optical proximity effects of the mask writer are in principle correctable with established OPC methods. To enhance mask patterning, an embedded OPC function, LinearityEqualize TM, has been developed for the Sigma7500- II that is transparent to the user and which does not degrade mask throughput. It employs a Calibre TM rule-based OPC engine from Mentor Graphics, selected for the computational speed necessary for mask run-time execution. A multinode cluster computer applies optimized table-based CD corrections to polygonized pattern data that is then fractured into an internal writer format for subsequent data processing. This embedded proximity correction flattens the linearity behavior for all linewidths and pitches, which targets to improve the CD uniformity on production photomasks. Printing results show that the CD linearity is reduced to below 5 nm for linewidths down to 200 nm, both for clear and dark and for isolated and dense features, and that sub-resolution assist features (SRAF) are reliably printed down to 120 nm. This reduction of proximity effects for main mask features and the extension of the practical resolution for SRAFs expands the application space of DUV laser mask writing.

High-throughput resistivity apparatus for thin-film combinatorial libraries

NASA Astrophysics Data System (ADS)

Hewitt, K. C.; Casey, P. A.; Sanderson, R. J.; White, M. A.; Sun, R.

2005-09-01

An apparatus, capable of measuring the dc resistance versus temperature of a 49-member library prepared by thin-film deposition techniques was designed and tested. The library is deposited by dc magnetron sputtering onto 10.16cm×10.16cm alumina substrates on which are placed aluminum masks consisting of 8mm diam holes cut on a 7×7 grid, the center-to-center spacing being 10.15mm. Electrical contact to the library is made in a standard van der Pauw geometry using 196 spring-loaded, gold-coated pins, four pins for each member of the library. The temperature is controlled using a helium refrigerator in combination with a liquid-nitrogen radiation shield that greatly reduces radiative heating of the sample stage. With the radiation shield, the cold finger is able to sustain a minimum temperature of 7K and the sample stage a minimum temperature of 27K. The temperature (27-291K) dependent dc resistivity of a thin-film silver library of varying thickness (48-639nm) is presented to highlight the capabilities of the apparatus. The thickness dependence of both the resistivity and the temperature coefficient of resistivity are quantitatively consistent with the literature. For thicknesses greater than about 100nm, the room-temperature resistivity (3.4μΩcm) are consistent with Matthiessen's rule for 1%-2% impurity content, and the temperature coefficient of resistivity is consistent with the bulk value. For thicknesses less than 100nm, an increase in resistivity by a factor of 8 is found, which may be due to surface and boundary scattering effects; a corresponding increase in the temperature coefficient of resistivity is consistent with a concomitant decrease in the magnitude of the elastic constants and surface scattering effects.

The optical design of solar spectrograph

NASA Astrophysics Data System (ADS)

Zhang, Yang; Pan, Wen-Qiang; Meng, Xiang-Yue; Lv, Xian-Kui; Feng, Jie; Zhu, Jia-Wei; Zhang, Xiao-Xiao; Li, Lei; Yang, Wei-Ping

2017-08-01

At the beginning of this paper, we simply describe the theories of spectrograph and the operating principle of grating. Based on the Spectrometer theory and optical theory we design a solar spectrograph by analyzing and calculating. And the working waveband of this solar spectrograph is between 510nm and 540nm. Besides, according to the design data, we ensure the blaze level of grating and the focal length of collimate. Due to the presence of the collimate in the optical structure, astigmatism exists in the system. For this reason, we add a cylindrical lens to the structure to correct. The optical system is characterized by using white-pupil design and folding light path to make the whole system simple. In the end, according to the calculated design parameters, we use the Zemax software for simulation, then the result is RMS only has 4μm at the 520nm. It's worth nothing that the resolution merely near the reference wavelength (520nm)meets the design requirements.

Visible camera cryostat design and performance for the SuMIRe Prime Focus Spectrograph (PFS)

NASA Astrophysics Data System (ADS)

Smee, Stephen A.; Gunn, James E.; Golebiowski, Mirek; Hope, Stephen C.; Madec, Fabrice; Gabriel, Jean-Francois; Loomis, Craig; Le fur, Arnaud; Dohlen, Kjetil; Le Mignant, David; Barkhouser, Robert; Carr, Michael; Hart, Murdock; Tamura, Naoyuki; Shimono, Atsushi; Takato, Naruhisa

2016-08-01

We describe the design and performance of the SuMIRe Prime Focus Spectrograph (PFS) visible camera cryostats. SuMIRe PFS is a massively multi-plexed ground-based spectrograph consisting of four identical spectrograph modules, each receiving roughly 600 fibers from a 2394 fiber robotic positioner at the prime focus. Each spectrograph module has three channels covering wavelength ranges 380 nm - 640 nm, 640 nm - 955 nm, and 955 nm - 1.26 um, with the dispersed light being imaged in each channel by a f/1.07 vacuum Schmidt camera. The cameras are very large, having a clear aperture of 300 mm at the entrance window, and a mass of 280 kg. In this paper we describe the design of the visible camera cryostats and discuss various aspects of cryostat performance.

78 FR 36434 - Revisions to Rules of Practice

Federal Register 2010, 2011, 2012, 2013, 2014

2013-06-18

... federal holidays, make grammatical corrections, and remove the reference to part-day holidays. Rule 3001... section, the following categories of persons are designated ``decision-making personnel'': (i) The.... The following categories of person are designated ``non-decision-making personnel'': (i) All...

Electromigration failures under bidirectional current stress

NASA Astrophysics Data System (ADS)

Tao, Jiang; Cheung, Nathan W.; Hu, Chenming

1998-01-01

Electromigration failure under DC stress has been studied for more than 30 years, and the methodologies for accelerated DC testing and design rules have been well established in the IC industry. However, the electromigration behavior and design rules under time-varying current stress are still unclear. In CMOS circuits, as many interconnects carry pulsed-DC (local VCC and VSS lines) and bidirectional AC current (clock and signal lines), it is essential to assess the reliability of metallization systems under these conditions. Failure mechanisms of different metallization systems (Al-Si, Al-Cu, Cu, TiN/Al-alloy/TiN, etc.) and different metallization structures (via, plug and interconnect) under AC current stress in a wide frequency range (from mHz to 500 MHz) has been study in this paper. Based on these experimental results, a damage healing model is developed, and electromigration design rules are proposed. It shows that in the circuit operating frequency range, the "design-rule current" is the time-average current. The pure AC component of the current only contributes to self-heating, while the average (DC component) current contributes to electromigration. To ensure longer thermal-migration lifetime under high frequency AC stress, an additional design rule is proposed to limit the temperature rise due to self-joule heating.

17 CFR Appendix A to Part 38 - Guidance on Compliance With Designation Criteria

Code of Federal Regulations, 2010 CFR

2010-04-01

... the criteria for designation. To the extent that compliance with, or satisfaction of, a criterion for designation is not self-explanatory from the face of the contract market's rules (as defined in § 40.1 of this... FACILITY—The board of trade shall—(A) establish and enforce rules defining, or specifications detailing...

10 CFR Appendix A to Part 52 - Design Certification Rule for the U.S. Advanced Boiling Water Reactor

Code of Federal Regulations, 2010 CFR

2010-01-01

... Water Reactor A Appendix A to Part 52 Energy NUCLEAR REGULATORY COMMISSION (CONTINUED) LICENSES... Rule for the U.S. Advanced Boiling Water Reactor I. Introduction Appendix A constitutes the standard design certification for the U.S. Advanced Boiling Water Reactor (ABWR) design, in accordance with 10 CFR...

10 CFR Appendix A to Part 52 - Design Certification Rule for the U.S. Advanced Boiling Water Reactor

Code of Federal Regulations, 2011 CFR

2011-01-01

... Water Reactor A Appendix A to Part 52 Energy NUCLEAR REGULATORY COMMISSION (CONTINUED) LICENSES... Rule for the U.S. Advanced Boiling Water Reactor I. Introduction Appendix A constitutes the standard design certification for the U.S. Advanced Boiling Water Reactor (ABWR) design, in accordance with 10 CFR...

76 FR 49303 - Approval and Promulgation of Air Quality Implementation Plans; Minnesota; Rules Update

Federal Register 2010, 2011, 2012, 2013, 2014

2011-08-10

... design requirements for the monitoring systems. The revised CMS rules also delineate the recordkeeping..., [Insert page number where the document begins]. 7017.1140 CEMS design 03/01/99 08/10/11, [Insert page...]. 7017.1190 COMS design 03/01/99 08/10/11, [Insert page requirements. number where the document begins...

Double Linear Damage Rule for Fatigue Analysis

NASA Technical Reports Server (NTRS)

Halford, G.; Manson, S.

1985-01-01

Double Linear Damage Rule (DLDR) method for use by structural designers to determine fatigue-crack-initiation life when structure subjected to unsteady, variable-amplitude cyclic loadings. Method calculates in advance of service how many loading cycles imposed on structural component before macroscopic crack initiates. Approach eventually used in design of high performance systems and incorporated into design handbooks and codes.

77 FR 64908 - Extension of Administrative Stay; Approval and Promulgation of Implementation Plans; New Mexico...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-10-24

... the Administrative Procedure Act (APA). EPA previously stayed this rule for 90 days, from July 16... Pursuant to section 705 of the APA, the EPA hereby extends the existing administrative stay of the... obligations under the terms of the NM FIP that arise during the 135 day period. Under section 705 of the APA...

Radiometric Quality of the MODIS Bands at 667 and 678nm

NASA Technical Reports Server (NTRS)

Meister, Gerhard; Franz, Bryan A.

2010-01-01

The MODIS instruments on Terra and Aqua were designed to allow the measurement of chlorophyll fluorescence effects over ocean. The retrieval algorithm is based on the difference between the water-leaving radiances at 667nm and 678nm. The water-leaving radiances at these wavelengths are usually very low relative to the top- of-atmosphere radiances. The high radiometric accuracy needed to retrieve the small fluorescence signal lead to a dual gain design for the 667 and 678nm bands. This paper discusses the benefits obtained from this design choice and provides justification for the use of only one set of gains for global processing of ocean color products. Noise characteristics of the two bands and their related products are compared to other products of bands from 412nm to 2130nm. The impact of polarization on the two bands is discussed. In addition, the impact of stray light on the two bands is compared to other MODIS bands.

Radiometric Quality of the MODIS Bands at 667 and 678nm

NASA Technical Reports Server (NTRS)

Meister, Gerhard; Franz, Bryan A.

2011-01-01

The MODIS instruments on Terra and Aqua were designed to allow the measurement of chlorophyll fluorescence effects over ocean. The retrieval algorithm is based on the difference between the water-leaving radiances at 667nm and 678nm. The water-leaving radiances at these wavelengths are usually very low relative to the top-of-atmosphere radiances. The high radiometric accuracy needed to retrieve the small fluorescence signal lead to a dual gain design for the 667 and 678nm bands. This paper discusses the benefits obtained from this design choice and provides justification for the use of only one set of gains for global processing of ocean color products. Noise characteristics of the two bands and their related products are compared to other products of bands from 412nm to 2130nm. The impact of polarization on the two bands is discussed. In addition, the impact of stray light on the two bands is compared to other MODIS bands.

Control of thermal deformation in dielectric mirrors using mechanical design and atomic layer deposition.

PubMed

Gabriel, Nicholas T; Kim, Sangho S; Talghader, Joseph J

2009-07-01

A mechanical design technique for optical coatings that simultaneously controls thermal deformation and optical reflectivity is reported. The method requires measurement of the refractive index and thermal stress of single films prior to the design. Atomic layer deposition was used for deposition because of the high repeatability of the film constants. An Al2O3/HfO2 distributed Bragg reflector was deposited with a predicted peak reflectivity of 87.9% at 542.4 nm and predicted edge deformation of -360 nm/K on a 10 cm silicon substrate. The measured peak reflectivity was 85.7% at 541.7 nm with an edge deformation of -346 nm/K.

High optical quality GaN nanopillar arrays

NASA Astrophysics Data System (ADS)

Wang, Y. D.; Chua, S. J.; Tripathy, S.; Sander, M. S.; Chen, P.; Fonstad, C. G.

2005-02-01

GaN nanopillar arrays have been fabricated by inductively coupled plasma etching of GaN films using anodic aluminum oxide film as an etch mask. The average diameter and length of these pillars are 60-65nm and 350-400nm, respectively. Ultraviolet microphotoluminescence measurements indicate high photoluminescence intensity and stress relaxation in these GaN nanopillars as compared to the starting epitaxial GaN films. Evidence of good crystalline quality is also observed by micro-Raman measurements, wherein a redshift of the E2high mode from GaN nanopillars suggests partial relaxation of the compressive strain. In addition, breakdown of the polarization selection rules led to the appearance of symmetry-forbidden and quasipolar modes.

Manufacturing and advanced characterization of sub-25nm diameter CD-AFM probes with sub-10nm tip edges radius

NASA Astrophysics Data System (ADS)

Foucher, Johann; Filippov, Pavel; Penzkofer, Christian; Irmer, Bernd; Schmidt, Sebastian W.

2013-04-01

Atomic force microscopy (AFM) is increasingly used in the semiconductor industry as a versatile monitoring tool for highly critical lithography and etching process steps. Applications range from the inspection of the surface roughness of new materials, over accurate depth measurements to the determination of critical dimension structures. The aim to address the rapidly growing demands on measurement uncertainty and throughput more and more shifts the focus of attention to the AFM tip, which represents the crucial link between AFM tool and the sample to be monitored. Consequently, in order to reach the AFM tool's full potential, the performance of the AFM tip has to be considered as a determining parameter. Currently available AFM tips made from silicon are generally limited by their diameter, radius, and sharpness, considerably restricting the AFM measurement capabilities on sub-30nm spaces. In addition to that, there's lack of adequate characterization structures to accurately characterize sub-25nm tip diameters. Here, we present and discuss a recently introduced AFM tip design (T-shape like design) with precise tip diameters down to 15nm and tip radii down to 5nm fabricated from amorphous, high density diamond-like carbon (HDC/DLC) using electron beam induced processing (EBIP). In addition to that advanced design, we propose a new characterizer structure, which allows for accurate characterization and design control of sub-25nm tip diameters and sub-10nm tip edges radii. We demonstrate the potential advantages of combining a small tip shape design, i.e. tip diameter and tip edge radius, and an advanced tip characterizer for the semiconductor industry by the measurement of advanced lithography patterns.

Temperature effects on tunable cw Alexandrite lasers under diode end-pumping.

PubMed

Kerridge-Johns, William R; Damzen, Michael J

2018-03-19

Diode pumped Alexandrite is a promising route to high power, efficient and inexpensive lasers with a broad (701 nm to 858 nm) gain bandwidth; however, there are challenges with its complex laser dynamics. We present an analytical model applied to experimental red diode end-pumped Alexandrite lasers, which enabled a record 54 % slope efficiency with an output power of 1.2 W. A record lowest lasing wavelength (714 nm) and record tuning range (104 nm) was obtained by optimising the crystal temperature between 8 °C and 105 °C in the vibronic mode. The properties of Alexandrite and the analytical model were examined to understand and give general rules in optimising Alexandrite lasers, along with their fundamental efficiency limits. It was found that the lowest threshold laser wavelength was not necessarily the most efficient, and that higher and lower temperatures were optimal for longer and shorter laser wavelengths, respectively. The pump excited to ground state absorption ratio was measured to decrease from 0.8 to 0.7 by changing the crystal temperature from 10 °C to 90 °C.

50 CFR 424.16 - Proposed rules.

Code of Federal Regulations, 2014 CFR

2014-10-01

... OF COMMERCE); ENDANGERED SPECIES COMMITTEE REGULATIONS SUBCHAPTER A LISTING ENDANGERED AND THREATENED SPECIES AND DESIGNATING CRITICAL HABITAT Revision of the Lists § 424.16 Proposed rules. (a) General. Based..., delisting, or reclassification of a species or the designation or revision of critical habitat will also...

75 FR 8759 - Submission for OMB Review; Comment Request

Federal Register 2010, 2011, 2012, 2013, 2014

2010-02-25

... rule proposal methods. The FOCUS Report was designed to eliminate the overlapping regulatory reports... SECURITIES AND EXCHANGE COMMISSION [Rule 17a-5; SEC File No. 270-155; OMB Control No. 3235-0123... currently valid control number. Rule 17a-5 (17 CFR 240.17a-5) is the basic financial reporting rule for...

78 FR 17969 - Self-Regulatory Organizations; Financial Industry Regulatory Authority, Inc.; Notice of...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-03-25

...-Regulatory Organizations; Financial Industry Regulatory Authority, Inc.; Notice of Designation of a Longer Period for Commission Action on Proposed Rule Change To Require Members To Report OTC Equity Transactions... (``Act'') \\1\\ and Rule 19b-4 thereunder,\\2\\ a proposed rule change to amend FINRA trade reporting rules...

17 CFR 240.3a40-1 - Designation of financial responsibility rules.

Code of Federal Regulations, 2010 CFR

2010-04-01

... relating to hypothecation or lending of customer securities; (c) Any rule adopted by any self-regulatory... other rule adopted by the Commission or any self-regulatory organization relating to the protection of...

Implementation of clinical decision rules in the emergency department.

PubMed

Stiell, Ian G; Bennett, Carol

2007-11-01

Clinical decision rules (CDRs) are tools designed to help clinicians make bedside diagnostic and therapeutic decisions. The development of a CDR involves three stages: derivation, validation, and implementation. Several criteria need to be considered when designing and evaluating the results of an implementation trial. In this article, the authors review the results of implementation studies evaluating the effect of four CDRs: the Ottawa Ankle Rules, the Ottawa Knee Rule, the Canadian C-Spine Rule, and the Canadian CT Head Rule. Four implementation studies demonstrated that the implementation of CDRs in the emergency department (ED) safely reduced the use of radiography for ankle, knee, and cervical spine injuries. However, a recent trial failed to demonstrate an impact on computed tomography imaging rates. Well-developed and validated CDRs can be successfully implemented into practice, efficiently standardizing ED care. However, further research is needed to identify barriers to implementation in order to achieve improved uptake in the ED.

The expert explorer: a tool for hospital data visualization and adverse drug event rules validation.

PubMed

Băceanu, Adrian; Atasiei, Ionuţ; Chazard, Emmanuel; Leroy, Nicolas

2009-01-01

An important part of adverse drug events (ADEs) detection is the validation of the clinical cases and the assessment of the decision rules to detect ADEs. For that purpose, a software called "Expert Explorer" has been designed by Ideea Advertising. Anonymized datasets have been extracted from hospitals into a common repository. The tool has 3 main features. (1) It can display hospital stays in a visual and comprehensive way (diagnoses, drugs, lab results, etc.) using tables and pretty charts. (2) It allows designing and executing dashboards in order to generate knowledge about ADEs. (3) It finally allows uploading decision rules obtained from data mining. Experts can then review the rules, the hospital stays that match the rules, and finally give their advice thanks to specialized forms. Then the rules can be validated, invalidated, or improved (knowledge elicitation phase).

MM-122: High speed civil transport

NASA Technical Reports Server (NTRS)

Demarest, Bill; Anders, Kurt; Manchec, John; Yang, Eric; Overgaard, Dan; Kalkwarf, Mike

1992-01-01

The rapidly expanding Pacific Rim market along with other growing markets indicates that the future market potential for a high speed civil transport is great indeed. The MM-122 is the answer to the international market desire for a state of the art, long range, high speed civil transport. It will carry 250 passengers a distance of 5200 nm at over twice the speed of sound. The MM-122 is designed to incorporate the latest technologies in the areas of control systems, propulsions, aerodynamics, and materials. The MM-122 will accomplish these goals using the following design parameters. First, a double delta wing planform with highly swept canards and an appropriately area ruled fuselage will be incorporated to accomplish desired aerodynamic characteristics. Propulsion will be provided by four low bypass variable cycle turbofan engines. A quad-redundant fly-by-wire flight control system will be incorporated to provide appropriate static stability and level 1 handling qualities. Finally, the latest in conventional metallic and modern composite materials will be used to provide desired weight and performance characteristics. The MM-122 incorporates the latest in technology and cost minimization techniques to provide a viable solution to this future market potential.

Self-Interest and the Design of Rules.

PubMed

Singh, Manvir; Wrangham, Richard; Glowacki, Luke

2017-12-01

Rules regulating social behavior raise challenging questions about cultural evolution in part because they frequently confer group-level benefits. Current multilevel selection theories contend that between-group processes interact with within-group processes to produce norms and institutions, but within-group processes have remained underspecified, leading to a recent emphasis on cultural group selection as the primary driver of cultural design. Here we present the self-interested enforcement (SIE) hypothesis, which proposes that the design of rules importantly reflects the relative enforcement capacities of competing parties. We show that, in addition to explaining patterns in cultural change and stability, SIE can account for the emergence of much group-functional culture. We outline how this process can stifle or accelerate cultural group selection, depending on various social conditions. Self-interested enforcement has important bearings on the emergence, stability, and change of rules.

Evaluation of a fast and flexible OPC package: OPTISSIMO

NASA Astrophysics Data System (ADS)

Maurer, Wilhelm; Waas, Thomas; Eisenmann, Hans

1996-12-01

It is out of question, that current state-of-the-art lithography--printing 350 nm structures with i-line tools or 250 nm structures with DUV tools--needs to correct for proximity effects (OPC). Otherwise, all the well-known effects like line-end shortening, linewidth variation as a function of adjacent patterns, linewidth non-linearity, etc. will produce a pattern, that is significantly different from the intended design. In this paper, we report first evaluation results of OPTISSIMO, a software package for automatic proximity correction. Besides the ability to handle full-chip designs by preserving as much as possible of the original data-hierarchy, there are significant options for the user. A large number of choices can be made to balance between the precision of the correction and the complexity of the corrected design. The main target of our evaluations was to check for full-chip OPC for the gate level of a state-of-the-art design. This corresponds to print either linewidths in the 350 nm to 400 nm range with i-line lithography or 250 nm/300 nm linewidth with DUV lithography. Taking 400 nm i-line lithography as an example, 3% precision OPC which has been demonstrated. By using hierarchical data handling, it was shown, that even the data complexity of a 256 M DRAM can be managed within reasonable time.

Monitoring Agents for Assisting NASA Engineers with Shuttle Ground Processing

NASA Technical Reports Server (NTRS)

Semmel, Glenn S.; Davis, Steven R.; Leucht, Kurt W.; Rowe, Danil A.; Smith, Kevin E.; Boeloeni, Ladislau

2005-01-01

The Spaceport Processing Systems Branch at NASA Kennedy Space Center has designed, developed, and deployed a rule-based agent to monitor the Space Shuttle's ground processing telemetry stream. The NASA Engineering Shuttle Telemetry Agent increases situational awareness for system and hardware engineers during ground processing of the Shuttle's subsystems. The agent provides autonomous monitoring of the telemetry stream and automatically alerts system engineers when user defined conditions are satisfied. Efficiency and safety are improved through increased automation. Sandia National Labs' Java Expert System Shell is employed as the agent's rule engine. The shell's predicate logic lends itself well to capturing the heuristics and specifying the engineering rules within this domain. The declarative paradigm of the rule-based agent yields a highly modular and scalable design spanning multiple subsystems of the Shuttle. Several hundred monitoring rules have been written thus far with corresponding notifications sent to Shuttle engineers. This chapter discusses the rule-based telemetry agent used for Space Shuttle ground processing. We present the problem domain along with design and development considerations such as information modeling, knowledge capture, and the deployment of the product. We also present ongoing work with other condition monitoring agents.

Ultimate strength performance of tankers associated with industry corrosion addition practices

NASA Astrophysics Data System (ADS)

Kim, Do Kyun; Kim, Han Byul; Zhang, Xiaoming; Li, Chen Guang; Paik, Jeom Kee

2014-09-01

In the ship and offshore structure design, age-related problems such as corrosion damage, local denting, and fatigue damage are important factors to be considered in building a reliable structure as they have a significant influence on the residual structural capacity. In shipping, corrosion addition methods are widely adopted in structural design to prevent structural capacity degradation. The present study focuses on the historical trend of corrosion addition rules for ship structural design and investigates their effects on the ultimate strength performance such as hull girder and stiffened panel of double hull oil tankers. Three types of rules based on corrosion addition models, namely historic corrosion rules (pre-CSR), Common Structural Rules (CSR), and harmonised Common Structural Rules (CSRH) are considered and compared with two other corrosion models namely UGS model, suggested by the Union of Greek Shipowners (UGS), and Time-Dependent Corrosion Wastage Model (TDCWM). To identify the general trend in the effects of corrosion damage on the ultimate longitudinal strength performance, the corrosion addition rules are applied to four representative sizes of double hull oil tankers namely Panamax, Aframax, Suezmax, and VLCC. The results are helpful in understanding the trend of corrosion additions for tanker structures

78 FR 36290 - Self-Regulatory Organizations; NYSE MKT LLC; Notice of Designation of a Longer Period for...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-06-17

... SECURITIES AND EXCHANGE COMMISSION [Release No. 34-69733; File No. SR-NYSEMKT-2013-25] Self-Regulatory Organizations; NYSE MKT LLC; Notice of Designation of a Longer Period for Commission Action on Proposed Rule Change Amending NYSE MKT Rule 104--Equities To Codify Certain Traditional Trading Floor Functions That May Be Performed by Designated...

Multi-arm group sequential designs with a simultaneous stopping rule.

PubMed

Urach, S; Posch, M

2016-12-30

Multi-arm group sequential clinical trials are efficient designs to compare multiple treatments to a control. They allow one to test for treatment effects already in interim analyses and can have a lower average sample number than fixed sample designs. Their operating characteristics depend on the stopping rule: We consider simultaneous stopping, where the whole trial is stopped as soon as for any of the arms the null hypothesis of no treatment effect can be rejected, and separate stopping, where only recruitment to arms for which a significant treatment effect could be demonstrated is stopped, but the other arms are continued. For both stopping rules, the family-wise error rate can be controlled by the closed testing procedure applied to group sequential tests of intersection and elementary hypotheses. The group sequential boundaries for the separate stopping rule also control the family-wise error rate if the simultaneous stopping rule is applied. However, we show that for the simultaneous stopping rule, one can apply improved, less conservative stopping boundaries for local tests of elementary hypotheses. We derive corresponding improved Pocock and O'Brien type boundaries as well as optimized boundaries to maximize the power or average sample number and investigate the operating characteristics and small sample properties of the resulting designs. To control the power to reject at least one null hypothesis, the simultaneous stopping rule requires a lower average sample number than the separate stopping rule. This comes at the cost of a lower power to reject all null hypotheses. Some of this loss in power can be regained by applying the improved stopping boundaries for the simultaneous stopping rule. The procedures are illustrated with clinical trials in systemic sclerosis and narcolepsy. © 2016 The Authors. Statistics in Medicine Published by John Wiley & Sons Ltd. © 2016 The Authors. Statistics in Medicine Published by John Wiley & Sons Ltd.

50 CFR 424.16 - Proposed rules.

Code of Federal Regulations, 2010 CFR

2010-10-01

... OF COMMERCE); ENDANGERED SPECIES COMMITTEE REGULATIONS SUBCHAPTER A LISTING ENDANGERED AND THREATENED SPECIES AND DESIGNATING CRITICAL HABITAT Revision of the Lists § 424.16 Proposed rules. (a) General. Based... reclassification of a species or the designation or revision of critical habitat shall also include a summary of...

50 CFR 424.18 - Final rules-general.

Code of Federal Regulations, 2014 CFR

2014-10-01

..., DEPARTMENT OF COMMERCE); ENDANGERED SPECIES COMMITTEE REGULATIONS SUBCHAPTER A LISTING ENDANGERED AND THREATENED SPECIES AND DESIGNATING CRITICAL HABITAT Revision of the Lists § 424.18 Final rules—general. (a... rule to list, delist, or reclassify a species or designate or revise critical habitat will also provide...

50 CFR 424.18 - Final rules-general.

Code of Federal Regulations, 2012 CFR

2012-10-01

..., DEPARTMENT OF COMMERCE); ENDANGERED SPECIES COMMITTEE REGULATIONS SUBCHAPTER A LISTING ENDANGERED AND THREATENED SPECIES AND DESIGNATING CRITICAL HABITAT Revision of the Lists § 424.18 Final rules—general. (a... rule to list, delist, or reclassify a species or designate or revise critical habitat will also provide...

Effective Design of Multifunctional Peptides by Combining Compatible Functions

PubMed Central

Diener, Christian; Garza Ramos Martínez, Georgina; Moreno Blas, Daniel; Castillo González, David A.; Corzo, Gerardo; Castro-Obregon, Susana; Del Rio, Gabriel

2016-01-01

Multifunctionality is a common trait of many natural proteins and peptides, yet the rules to generate such multifunctionality remain unclear. We propose that the rules defining some protein/peptide functions are compatible. To explore this hypothesis, we trained a computational method to predict cell-penetrating peptides at the sequence level and learned that antimicrobial peptides and DNA-binding proteins are compatible with the rules of our predictor. Based on this finding, we expected that designing peptides for CPP activity may render AMP and DNA-binding activities. To test this prediction, we designed peptides that embedded two independent functional domains (nuclear localization and yeast pheromone activity), linked by optimizing their composition to fit the rules characterizing cell-penetrating peptides. These peptides presented effective cell penetration, DNA-binding, pheromone and antimicrobial activities, thus confirming the effectiveness of our computational approach to design multifunctional peptides with potential therapeutic uses. Our computational implementation is available at http://bis.ifc.unam.mx/en/software/dcf. PMID:27096600

78 FR 79720 - Self-Regulatory Organizations; NYSE MKT LLC; Notice of Designation of a Longer Period for...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-12-31

... Proposed Rule Change, as Modified by Amendment No. 1 Thereto, To Adopt Commentary .03 to Rule 980NY To Limit the Volume of Complex Orders by a Single ATP Holder During the Trading Day December 24, 2013. On...\\ and Rule 19b-4 thereunder,\\2\\ a proposed rule change to adopt Commentary .03 to NYSE MKT Rule 980NY to...

77 FR 55517 - Self-Regulatory Organizations; Financial Industry Regulatory Authority, Inc.; Order Approving a...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-09-10

...\\ FINRA Rule 6140(a) defines a ``designated security'' as any NMS stock as defined in Rule 600(b)(47) of Regulation NMS, 17 CFR 242.600(b)(47). \\8\\ See FINRA Rule 6140(h)(1)(A)-(B). \\9\\ See FINRA Rule 6140(h)(2... requirements of Section 15A(b) of the Act \\47\\ and the rules and regulations thereunder applicable to a...

Automating the design of scientific computing software

NASA Technical Reports Server (NTRS)

Kant, Elaine

1992-01-01

SINAPSE is a domain-specific software design system that generates code from specifications of equations and algorithm methods. This paper describes the system's design techniques (planning in a space of knowledge-based refinement and optimization rules), user interaction style (user has option to control decision making), and representation of knowledge (rules and objects). It also summarizes how the system knowledge has evolved over time and suggests some issues in building software design systems to facilitate reuse.

Rule-Based Design of Plant Expression Vectors Using GenoCAD.

PubMed

Coll, Anna; Wilson, Mandy L; Gruden, Kristina; Peccoud, Jean

2015-01-01

Plant synthetic biology requires software tools to assist on the design of complex multi-genic expression plasmids. Here a vector design strategy to express genes in plants is formalized and implemented as a grammar in GenoCAD, a Computer-Aided Design software for synthetic biology. It includes a library of plant biological parts organized in structural categories and a set of rules describing how to assemble these parts into large constructs. Rules developed here are organized and divided into three main subsections according to the aim of the final construct: protein localization studies, promoter analysis and protein-protein interaction experiments. The GenoCAD plant grammar guides the user through the design while allowing users to customize vectors according to their needs. Therefore the plant grammar implemented in GenoCAD will help plant biologists take advantage of methods from synthetic biology to design expression vectors supporting their research projects.

77 FR 30087 - Air Quality Designations for the 2008 Ozone National Ambient Air Quality Standards

Federal Register 2010, 2011, 2012, 2013, 2014

2012-05-21

...This rule establishes initial air quality designations for most areas in the United States, including areas of Indian country, for the 2008 primary and secondary national ambient air quality standards (NAAQS) for ozone. The designations for several counties in Illinois, Indiana, and Wisconsin that the EPA is considering for inclusion in the Chicago nonattainment area will be designated in a subsequent action, no later than May 31, 2012. Areas designated as nonattainment are also being classified by operation of law according to the severity of their air quality problems. The classification categories are Marginal, Moderate, Serious, Severe, and Extreme. The EPA is establishing the air quality thresholds that define the classifications in a separate rule that the EPA is signing and publishing in the Federal Register on the same schedule as these designations. In accordance with that separate rule, six nonattainment areas in California are being reclassified to a higher classification.

Model-based approach for design verification and co-optimization of catastrophic and parametric-related defects due to systematic manufacturing variations

NASA Astrophysics Data System (ADS)

Perry, Dan; Nakamoto, Mark; Verghese, Nishath; Hurat, Philippe; Rouse, Rich

2007-03-01

Model-based hotspot detection and silicon-aware parametric analysis help designers optimize their chips for yield, area and performance without the high cost of applying foundries' recommended design rules. This set of DFM/ recommended rules is primarily litho-driven, but cannot guarantee a manufacturable design without imposing overly restrictive design requirements. This rule-based methodology of making design decisions based on idealized polygons that no longer represent what is on silicon needs to be replaced. Using model-based simulation of the lithography, OPC, RET and etch effects, followed by electrical evaluation of the resulting shapes, leads to a more realistic and accurate analysis. This analysis can be used to evaluate intelligent design trade-offs and identify potential failures due to systematic manufacturing defects during the design phase. The successful DFM design methodology consists of three parts: 1. Achieve a more aggressive layout through limited usage of litho-related recommended design rules. A 10% to 15% area reduction is achieved by using more aggressive design rules. DFM/recommended design rules are used only if there is no impact on cell size. 2. Identify and fix hotspots using a model-based layout printability checker. Model-based litho and etch simulation are done at the cell level to identify hotspots. Violations of recommended rules may cause additional hotspots, which are then fixed. The resulting design is ready for step 3. 3. Improve timing accuracy with a process-aware parametric analysis tool for transistors and interconnect. Contours of diffusion, poly and metal layers are used for parametric analysis. In this paper, we show the results of this physical and electrical DFM methodology at Qualcomm. We describe how Qualcomm was able to develop more aggressive cell designs that yielded a 10% to 15% area reduction using this methodology. Model-based shape simulation was employed during library development to validate architecture choices and to optimize cell layout. At the physical verification stage, the shape simulator was run at full-chip level to identify and fix residual hotspots on interconnect layers, on poly or metal 1 due to interaction between adjacent cells, or on metal 1 due to interaction between routing (via and via cover) and cell geometry. To determine an appropriate electrical DFM solution, Qualcomm developed an experiment to examine various electrical effects. After reporting the silicon results of this experiment, which showed sizeable delay variations due to lithography-related systematic effects, we also explain how contours of diffusion, poly and metal can be used for silicon-aware parametric analysis of transistors and interconnect at the cell-, block- and chip-level.

KPF: Keck Planet Finder

NASA Astrophysics Data System (ADS)

Gibson, Steven R.; Howard, Andrew W.; Marcy, Geoffrey W.; Edelstein, Jerry; Wishnow, Edward H.; Poppett, Claire L.

2016-08-01

KPF is a fiber-fed, high-resolution, high-stability spectrometer in development at the UC Berkeley Space Sciences Laboratory for the W.M. Keck Observatory. The instrument is designed to characterize exoplanets via Doppler spectroscopy with a single measurement precision of 0.5ms-1 or better, however its resolution and stability will enable a wide variety of astrophysical pursuits. KPF will have a 200mm collimated beam diameter and a resolving power of >80,000. The design includes a green channel (440nm to 590 nm) and red channel (590nm to 850 nm). A novel design aspect of KPF is the use of a Zerodur optical bench, and Zerodur optics with integral mounts, to provide stability against thermal expansion and contraction effects.

Video Self-Modeling to Teach Classroom Rules to Two Students with Asperger's

ERIC Educational Resources Information Center

Lang, Russell; Shogren, Karrie A.; Machalicek, Wendy; Rispoli, Mandy; O'Reilly, Mark; Baker, Sonia; Regester, April

2009-01-01

Classroom rules are an integral part of classroom management. Children with Asperger's may require systematic instruction to learn classroom rules, but may be placed in classrooms in which the rules are not explicitly taught. A multiple baseline design across students with probes for maintenance after the intervention ceased was used to evaluate…

78 FR 36625 - Self-Regulatory Organizations; Chicago Mercantile Exchange Inc.; Notice of Designation of a...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-06-18

...\\ and Rule 19b-4 thereunder,\\2\\ a proposed rule change to make adjustments to the liquidity risk factor... liquidity risk factor component. The proposed rule change was published for comment in the Federal Register... on Proposed Rule Change Related to the Liquidity Factor of CME's CDS Margin Methodology June 12, 2013...

Simulation and measurement of nanometer-scale resistivity of copper films for interconnect applications

NASA Astrophysics Data System (ADS)

Yarimbiyik, Arif Emre

2007-12-01

A highly versatile simulation program is developed and used to examine how the resistivity of thin metal films and lines increases as their dimensions approach and become smaller than the mean fee path of electrons in metals such as copper (size effect). The simulation program: (1) provides a more accurate calculation of surface scattering effects than that obtained from the usual formulation of Fuchs' theory, (2) calculates grain-boundary effects that are consistent with the theory of Mayadas and Shatzkes, (3) includes the effects of surface and grain-boundary scattering either separately or together, and (4) simulates the effect on resistivity if a surface of a film or line has a different value for the scattering parameter. The increase in resistivity with decreasing thickness of thin, evaporated copper films (approximately 10 nm to 150 nm thick) was determined from sheet resistance and film thickness measurements. Good agreement between the experimental results with those of the simulation program was obtained when the measured mean grain sizes were used by the simulation program. The mean of the grain sizes tend to decrease with decreasing film thickness and thereby increase the impact of grain-boundary scattering on the effective resistivity of the film. Estimates of the mean grain size for each film were determined from using, in combination, the electron backscatter diffraction (EBSD) and the X-ray diffraction (XRD) methods. With values for the measured change in sheet resistance with temperature of these films, it is shown that measurements of the electrical film thickness, using Matthiessen's rule, agreed to within 3 nm of the physical measurements (profilometer) of these films. Hence, Matthiessen's rule can continue to be used to measure the thickness of a copper film and, by inference, the cross-sectional area of a copper line for dimensions well below the mean free path of electrons in copper at room temperature (39 nm).

'Ten Golden Rules' for Designing Software in Medical Education: Results from a Formative Evaluation of DIALOG.

ERIC Educational Resources Information Center

Jha, Vikram; Duffy, Sean

2002-01-01

Reports the results of an evaluation of Distance Interactive Learning in Obstetrics and Gynecology (DIALOG) which is an electronic program for continuing education. Presents 10 golden rules for designing software for medical practitioners. (Contains 26 references.) (Author/YDS)

77 FR 39277 - Self-Regulatory Organizations; NASDAQ OMX BX, Inc.; Order Granting Approval of a Proposed Rule...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-07-02

... with a time-in- force designation of Good Til canceled (``GTC'') are treated as having a time-in-force... designation of Good Til Cancelled or Immediate or Cancel. See proposed BX Options Rules, Chapter VI, Section 1...

46 CFR 116.300 - Structural design.

Code of Federal Regulations, 2013 CFR

2013-10-01

... Structure § 116.300 Structural design. Except as otherwise allowed by this subpart, a vessel must comply... the vessel. (a) Steel hull vessels: (1) Rules and Regulations for the Classification of Yachts and Small Craft, Lloyd's Register of Shipping (Lloyd's); or (2) Rules for Building and Classing Steel...

46 CFR 116.300 - Structural design.

Code of Federal Regulations, 2012 CFR

2012-10-01

... Structure § 116.300 Structural design. Except as otherwise allowed by this subpart, a vessel must comply... the vessel. (a) Steel hull vessels: (1) Rules and Regulations for the Classification of Yachts and Small Craft, Lloyd's Register of Shipping (Lloyd's); or (2) Rules for Building and Classing Steel...

46 CFR 116.300 - Structural design.

Code of Federal Regulations, 2010 CFR

2010-10-01

... Structure § 116.300 Structural design. Except as otherwise allowed by this subpart, a vessel must comply... the vessel. (a) Steel hull vessels: (1) Rules and Regulations for the Classification of Yachts and Small Craft, Lloyd's Register of Shipping (Lloyd's); or (2) Rules for Building and Classing Steel...

46 CFR 116.300 - Structural design.

Code of Federal Regulations, 2011 CFR

2011-10-01

... Structure § 116.300 Structural design. Except as otherwise allowed by this subpart, a vessel must comply... the vessel. (a) Steel hull vessels: (1) Rules and Regulations for the Classification of Yachts and Small Craft, Lloyd's Register of Shipping (Lloyd's); or (2) Rules for Building and Classing Steel...

46 CFR 116.300 - Structural design.

Code of Federal Regulations, 2014 CFR

2014-10-01

... Structure § 116.300 Structural design. Except as otherwise allowed by this subpart, a vessel must comply... the vessel. (a) Steel hull vessels: (1) Rules and Regulations for the Classification of Yachts and Small Craft, Lloyd's Register of Shipping (Lloyd's); or (2) Rules for Building and Classing Steel...

Intelligent design is not science, U.S. judge rules

NASA Astrophysics Data System (ADS)

Zielinski, Sarah

A Pennsylvania school district may not mandate the teaching of ‘intelligent design’ because the concept is not science and cannot be uncoupled from its religious roots in creationism, a U.S. federal judge ruled on 20 December.U.S. District Judge John E. Jones III ruled that the Dover, Pa., school board's policy on intelligent design violates the Establishment Clause of the First Amendment of the U.S. Constitution, which forbids the government from establishing a state religion, and also violates the Pennsylvania state constitution.

Printing Smart Designs of Light Emitting Devices with Maintained Textile Properties †

PubMed Central

Verboven, Inge; Stryckers, Jeroen; Mecnika, Viktorija; Vandevenne, Glen; Jose, Manoj

2018-01-01

To maintain typical textile properties, smart designs of light emitting devices are printed directly onto textile substrates. A first approach shows improved designs for alternating current powder electroluminescence (ACPEL) devices. A configuration with the following build-up, starting from the textile substrate, was applied using the screen printing technique: silver (10 µm)/barium titanate (10 µm)/zinc-oxide (10 µm) and poly(3,4-ethylenedioxythiophene)poly(styrenesulfonate) (10 µm). Textile properties such as flexibility, drapability and air permeability are preserved by implementing a pixel-like design of the printed layers. Another route is the application of organic light emitting devices (OLEDs) fabricated out of following layers, also starting from the textile substrate: polyurethane or acrylate (10–20 µm) as smoothing layer/silver (200 nm)/poly(3,4-ethylenedioxythiophene)poly(styrenesulfonate) (35 nm)/super yellow (80 nm)/calcium/aluminum (12/17 nm). Their very thin nm-range layer thickness, preserving the flexibility and drapability of the substrate, and their low working voltage, makes these devices the possible future in light-emitting wearables. PMID:29438276

75 FR 37740 - Apricots Grown in Designated Counties in Washington; Increased Assessment Rate

Federal Register 2010, 2011, 2012, 2013, 2014

2010-06-30

... Washington; Increased Assessment Rate AGENCY: Agricultural Marketing Service, USDA. ACTION: Proposed rule. SUMMARY: This rule would increase the assessment rate established for the Washington Apricot Marketing..., June 30, 2010 / Proposed Rules#0;#0; [[Page 37740

A three degree of freedom manipulator used for store separation wind tunnel test

NASA Astrophysics Data System (ADS)

Wei, R.; Che, B.-H.; Sun, C.-B.; Zhang, J.; Lu, Y.-Q.

2018-06-01

A three degree of freedom manipulator is presented, which is used for store separation wind tunnel test. It is a kind of mechatronics product, have small volume and large moment of torque. The paper researched the design principle of wind tunnel test equipment, also introduced the transmission principle design, physical design, control system design, drive element selection calculation and verification, dynamics computation and static structural computation of the manipulator. To satisfy the design principle of wind tunnel test equipment, some optimization design are made include optimizes the structure of drive element and cable, fairing configuration, overall dimension so that to make the device more suitable for the wind tunnel test. Some tests are made to verify the parameters of the manipulator. The results show that the device improves the load from 100 Nm to 250 Nm, control accuracy from 0.1°to 0.05°in pitch and yaw, also improves load from 10 Nm to 20 Nm, control accuracy from 0.1°to 0.05°in roll.

Biology Teachers Designing Context-Based Lessons for Their Classroom Practice--The Importance of Rules-of-Thumb

ERIC Educational Resources Information Center

Wieringa, Nienke; Janssen, Fred J. J. M.; Van Driel, Jan H.

2011-01-01

In science education in the Netherlands new, context-based, curricula are being developed. As in any innovation, the outcome will largely depend on the teachers who design and implement lessons. Central to the study presented here is the idea that teachers, when designing lessons, use rules-of-thumb: notions of what a lesson should look like if…

Device and circuit-level performance of carbon nanotube field-effect transistor with benchmarking against a nano-MOSFET

PubMed Central

2012-01-01

The performance of a semiconducting carbon nanotube (CNT) is assessed and tabulated for parameters against those of a metal-oxide-semiconductor field-effect transistor (MOSFET). Both CNT and MOSFET models considered agree well with the trends in the available experimental data. The results obtained show that nanotubes can significantly reduce the drain-induced barrier lowering effect and subthreshold swing in silicon channel replacement while sustaining smaller channel area at higher current density. Performance metrics of both devices such as current drive strength, current on-off ratio (Ion/Ioff), energy-delay product, and power-delay product for logic gates, namely NAND and NOR, are presented. Design rules used for carbon nanotube field-effect transistors (CNTFETs) are compatible with the 45-nm MOSFET technology. The parasitics associated with interconnects are also incorporated in the model. Interconnects can affect the propagation delay in a CNTFET. Smaller length interconnects result in higher cutoff frequency. PMID:22901374

Trends in Dielectric Etch for Microelectronics Processing

NASA Astrophysics Data System (ADS)

Hudson, Eric A.

2003-10-01

Dielectric etch technology faces many challenges to meet the requirements for leading-edge microelectronics processing. The move to sub 100-nm device design rules increases the aspect ratios of certain features, imposes tighter restrictions on etched features' critical dimensions, and increases the density of closely packed arrays of features. Changes in photolithography are driving transitions to new photoresist materials and novel multilayer resist methods. The increasing use of copper metallization and low-k interlayer dielectric materials has introduced dual-damascene integration methods, with specialized dielectric etch applications. A common need is the selective removal of multiple layers which have very different compositions, while maintaining close control of the etched features' profiles. To increase productivity, there is a growing trend toward in-situ processing, which allows several films to be successively etched during a single pass through the process module. Dielectric etch systems mainly utilize capacitively coupled etch reactors, operating with medium-density plasmas and low gas residence time. Commercial technology development increasingly relies upon plasma diagnostics and modeling to reduce development cycle time and maximize performance.

Experimental study of contact edge roughness on sub-100 nm various circular shapes

NASA Astrophysics Data System (ADS)

Lee, Tae Y.; Ihm, Dongchul; Kang, Hyo C.; Lee, Jum B.; Lee, Byoung H.; Chin, Soo B.; Cho, Do H.; Song, Chang L.

2005-05-01

The measurement of edge roughness has become a hot issue in the semiconductor industry. Especially the contact roughness is being more critical as design rule shrinks. Major vendors offer a variety of features to measure the edge roughness in their CD-SEMs. For the line and space patterns, features such as Line Edge Roughness (LER) and Line Width Roughness (LWR) are available in current CD-SEMs. However the features currently available in commercial CD-SEM cannot provide a proper solution in monitoring the contact roughness. We had introduced a new parameter R, measurement algorithm and definition of contact edge roughness to quantify CER and CSR in previous paper. The parameter, R could provide an alternative solution to monitor contact or island pattern roughness. In this paper, we investigated to assess optimum number of CD measurement (1-D) and fitting method for CER or CSR. The study was based on a circular contact shape. Some new ideas to quantify CER or CSR were also suggested with preliminary experimental results.

A step-by-step introduction to rule-based design of synthetic genetic constructs using GenoCAD.

PubMed

Wilson, Mandy L; Hertzberg, Russell; Adam, Laura; Peccoud, Jean

2011-01-01

GenoCAD is an open source web-based system that provides a streamlined, rule-driven process for designing genetic sequences. GenoCAD provides a graphical interface that allows users to design sequences consistent with formalized design strategies specific to a domain, organization, or project. Design strategies include limited sets of user-defined parts and rules indicating how these parts are to be combined in genetic constructs. In addition to reducing design time to minutes, GenoCAD improves the quality and reliability of the finished sequence by ensuring that the designs follow established rules of sequence construction. GenoCAD.org is a publicly available instance of GenoCAD that can be found at www.genocad.org. The source code and latest build are available from SourceForge to allow advanced users to install and customize GenoCAD for their unique needs. This chapter focuses primarily on how the GenoCAD tools can be used to organize genetic parts into customized personal libraries, then how these libraries can be used to design sequences. In addition, GenoCAD's parts management system and search capabilities are described in detail. Instructions are provided for installing a local instance of GenoCAD on a server. Some of the future enhancements of this rapidly evolving suite of applications are briefly described. Copyright © 2011 Elsevier Inc. All rights reserved.

Dispersion-optimized optical fiber for high-speed long-haul dense wavelength division multiplexing transmission

NASA Astrophysics Data System (ADS)

Wu, Jindong; Chen, Liuhua; Li, Qingguo; Wu, Wenwen; Sun, Keyuan; Wu, Xingkun

2011-07-01

Four non-zero-dispersion-shifted fibers with almost the same large effective area (Aeff) and optimized dispersion properties are realized by novel index profile designing and modified vapor axial deposition and modified chemical vapor deposition processes. An Aeff of greater than 71 μm2 is obtained for the designed fibers. Three of the developed fibers with positive dispersion are improved by reducing the 1550nm dispersion slope from 0.072ps/nm2/km to 0.063ps/nm2/km or 0.05ps/nm2/km, increasing the 1550nm dispersion from 4.972ps/nm/km to 5.679ps/nm/km or 7.776ps/nm/km, and shifting the zero-dispersion wavelength from 1500nm to 1450nm. One of these fibers is in good agreement with G655D and G.656 fibers simultaneously, and another one with G655E and G.656 fibers; both fibers are beneficial to high-bit long-haul dense wavelength division multiplexing systems over S-, C-, and L-bands. The fourth developed fiber with negative dispersion is also improved by reducing the 1550nm dispersion slope from 0.12ps/nm2/km to 0.085ps/nm2/km, increasing the 1550nm dispersion from -4ps/nm/km to -6.016ps/nm/km, providing facilities for a submarine transmission system. Experimental measurements indicate that the developed fibers all have excellent optical transmission and good macrobending and splice performances.

77 FR 2103 - Self-Regulatory Organizations; Fixed Income Clearing Corporation; Notice of Designation of Longer...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-01-13

...-Regulatory Organizations; Fixed Income Clearing Corporation; Notice of Designation of Longer Period for Commission Action on Proposed Rule Change To Allow the Mortgage-Backed Securities Division To Provide...''), and on November 21, 2011, amended a proposed rule change to allow the Mortgage-Backed Securities...

78 FR 18402 - Self-Regulatory Organizations; New York Stock Exchange LLC; NYSE MKT LLC; Notice of Designation...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-03-26

...-4 thereunder,\\2\\ proposed rule changes to allow Retail Member Organizations (``RMOs'') to attest...-regulatory organization consents, the Commission shall either approve the proposed rule change, disapprove...-07] Self-Regulatory Organizations; New York Stock Exchange LLC; NYSE MKT LLC; Notice of Designation...

76 FR 22070 - Negotiated Rulemaking Committee on Designation of Medically Underserved Populations and Health...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-04-20

... DEPARTMENT OF HEALTH AND HUMAN SERVICES 42 CFR Part 5 Negotiated Rulemaking Committee on Designation of Medically Underserved Populations and Health Professional Shortage Areas; Notice of Meeting Correction Proposed Rule document 2011-9081 was inadvertently published in the Rules section of the issue of...

Performance characteristics of two volume phase holographic grisms produced for the ESPRESSO spectrograph

NASA Astrophysics Data System (ADS)

Arns, James A.

2016-08-01

The ESPRESSO spectrograph [1], a new addition to the European Southern Observatory's (ESO) Very Large Telescope (VLT), requires two volume phase holographic (VPH) grisms, one blue and the other red, splitting the overall spectral range of the instrument to maximize throughput while achieving high resolution. The blue grism covers the spectral range from 375 nm to 520 nm with a dispersion of 0.88 degrees/nm at the central wavelength of 438 nm. The red grism operates from 535 nm to 780 nm with a dispersion of 0.47 degrees/nm at 654.8 nm. Both designs use a single input prism to enhance the dispersion of the grism assembly. The grisms are relatively large in size with a working aperture of 185 mm x 185 mm for the blue grism and 215 nm x 185 mm for the red grism respectively. This paper describes the specifications of the two grating types, gives the rigorous coupled wave analysis (RCWA) theoretical performances of diffraction efficiency for the production designs and presents the measured performances of each of the delivered grisms.

19 CFR 191.7 - General manufacturing drawback ruling.

Code of Federal Regulations, 2010 CFR

2010-04-01

... followed without variation; and (iv) The described manufacturing or production process is a manufacture or... ruling. (a) Purpose; eligibility. General manufacturing drawback rulings are designed to simplify... parent corporation is engaged in manufacture or production for drawback, the subsidiary is the proper...

Spectral sensitivity of guppy visual pigments reconstituted in vitro to resolve association of opsins with cone cell types.

PubMed

Kawamura, Shoji; Kasagi, Satoshi; Kasai, Daisuke; Tezuka, Ayumi; Shoji, Ayako; Takahashi, Akiyoshi; Imai, Hiroo; Kawata, Masakado

2016-10-01

The guppy (Poecilia reticulata) shows remarkable variation of photoreceptor cells in the retina, especially those sensitive to middle-to-long wavelengths of light. Microspectrophotometry (MSP) has revealed varying "green", "green-yellow" and "yellow" cone cells among guppies in Trinidad and Venezuela (Cumana). In the guppy genome, there are four "long-wave" opsin loci (LWS-1, -2, -3 and -4). Two LWS-1 alleles have potentially differing spectral sensitivity (LWS-1/180Ser and LWS-1/180Ala). In addition, two "middle-wave" loci (RH2-1 and -2), two "short-wave" loci (SWS2-A and -B), and a single "ultraviolet" locus (SWS1) as well as a single "rhodopsin" locus (RH1) are present. However, the absorption spectra of these photopigments have not been measured directly and the association of cell types with these opsins remains speculative. In the present study, we reconstituted these opsin photopigments in vitro. The wavelengths of maximal absorbance (λmax) were 571nm (LWS-1/180Ser), 562nm (LWS-1/180Ala), 519nm (LWS-3), 516nm (LWS-2), 516nm (RH2-1), 476nm (RH2-2), 438nm (SWS2-A), 408nm (SWS2-B), 353nm (SWS1) and 503nm (RH1). The λmax of LWS-3 is much shorter than the value expected (560nm) from the "five-sites" rule. The two LWS-1 alleles could explain difference of the reported MSP λmax values for the yellow cone class between Trinidad and Cumana guppies. Absence of the short-wave-shifted LWS-3 and the green-yellow cone in the green swordtail supports the hypothesis that this cell class of the guppy co-expresses the LWS-1 and LWS-3. These results reveal the basis of variability in the guppy visual system and provide insight into the behavior and ecology of these tropical fishes. Copyright © 2016. Published by Elsevier Ltd.

Evaluation of the influence of dominance rules for the assembly line design problem under consideration of product design alternatives

NASA Astrophysics Data System (ADS)

Oesterle, Jonathan; Lionel, Amodeo

2018-06-01

The current competitive situation increases the importance of realistically estimating product costs during the early phases of product and assembly line planning projects. In this article, several multi-objective algorithms using difference dominance rules are proposed to solve the problem associated with the selection of the most effective combination of product and assembly lines. The list of developed algorithms includes variants of ant colony algorithms, evolutionary algorithms and imperialist competitive algorithms. The performance of each algorithm and dominance rule is analysed by five multi-objective quality indicators and fifty problem instances. The algorithms and dominance rules are ranked using a non-parametric statistical test.

A New Trend-Following Indicator: Using SSA to Design Trading Rules

NASA Astrophysics Data System (ADS)

Leles, Michel Carlo Rodrigues; Mozelli, Leonardo Amaral; Guimarães, Homero Nogueira

Singular Spectrum Analysis (SSA) is a non-parametric approach that can be used to decompose a time-series as trends, oscillations and noise. Trend-following strategies rely on the principle that financial markets move in trends for an extended period of time. Moving Averages (MAs) are the standard indicator to design such strategies. In this study, SSA is used as an alternative method to enhance trend resolution in comparison with the traditional MA. New trading rules using SSA as indicator are proposed. This paper shows that for the Down Jones Industrial Average (DJIA) and Shangai Securities Composite Index (SSCI) time-series the SSA trading rules provided, in general, better results in comparison to MA trading rules.

78 FR 72965 - Self-Regulatory Organizations; NYSE MKT LLC; Notice of Filing of Proposed Rule Change Amending...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-12-04

... that MPL Orders may interact with Capital Commitment Schedule (``CCS'') interest; (3) NYSE MKT Rule 70... may interact with CCS interest; (3) NYSE MKT Rule 70.25--Equities to permit d-Quotes to be designated... specifically noted otherwise. DMM interest entered via the CCS pursuant to Rule 1000 would not be permitted to...

76 FR 35933 - Self-Regulatory Organizations; Financial Industry Regulatory Authority, Inc.; Notice of Filing...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-06-20

... securities. \\5\\ The exemption in FINRA Rule 6730(e)(4) is conditioned, among other things, upon a data... 15A(b)(6) of the Act,\\6\\ which requires, among other things, that FINRA rules must be designed to... Commission's Internet comment form ( http://www.sec.gov/rules/sro.shtml ); or Send an e-mail to rule-comments...

Evaluation of a multi-arm multi-stage Bayesian design for phase II drug selection trials - an example in hemato-oncology.

PubMed

Jacob, Louis; Uvarova, Maria; Boulet, Sandrine; Begaj, Inva; Chevret, Sylvie

2016-06-02

Multi-Arm Multi-Stage designs aim at comparing several new treatments to a common reference, in order to select or drop any treatment arm to move forward when such evidence already exists based on interim analyses. We redesigned a Bayesian adaptive design initially proposed for dose-finding, focusing our interest in the comparison of multiple experimental drugs to a control on a binary criterion measure. We redesigned a phase II clinical trial that randomly allocates patients across three (one control and two experimental) treatment arms to assess dropping decision rules. We were interested in dropping any arm due to futility, either based on historical control rate (first rule) or comparison across arms (second rule), and in stopping experimental arm due to its ability to reach a sufficient response rate (third rule), using the difference of response probabilities in Bayes binomial trials between the treated and control as a measure of treatment benefit. Simulations were then conducted to investigate the decision operating characteristics under a variety of plausible scenarios, as a function of the decision thresholds. Our findings suggest that one experimental treatment was less efficient than the control and could have been dropped from the trial based on a sample of approximately 20 instead of 40 patients. In the simulation study, stopping decisions were reached sooner for the first rule than for the second rule, with close mean estimates of response rates and small bias. According to the decision threshold, the mean sample size to detect the required 0.15 absolute benefit ranged from 63 to 70 (rule 3) with false negative rates of less than 2 % (rule 1) up to 6 % (rule 2). In contrast, detecting a 0.15 inferiority in response rates required a sample size ranging on average from 23 to 35 (rules 1 and 2, respectively) with a false positive rate ranging from 3.6 to 0.6 % (rule 3). Adaptive trial design is a good way to improve clinical trials. It allows removing ineffective drugs and reducing the trial sample size, while maintaining unbiased estimates. Decision thresholds can be set according to predefined fixed error decision rates. ClinicalTrials.gov Identifier: NCT01342692 .

Instrument Design of the Large Aperture Solar UV Visible and IR Observing Telescope (SUVIT) for the SOLAR-C Mission

NASA Astrophysics Data System (ADS)

Suematsu, Y.; Katsukawa, Y.; Shimizu, T.; Ichimoto, K.; Takeyama, N.

2012-12-01

We present an instrumental design of one major solar observation payload planned for the SOLAR-C mission: the Solar Ultra-violet Visible and near IR observing Telescope (SUVIT). The SUVIT is designed to provide high-angular-resolution investigation of the lower solar atmosphere, from the photosphere to the uppermost chromosphere, with enhanced spectroscopic and spectro-polarimetric capability in wide wavelength regions from 280 nm (Mg II h&k lines) to 1100 nm (He I 1083 nm line) with 1.5 m class aperture and filtergraphic and spectrographic instruments.

Design and fabrication of far ultraviolet filters based on π-multilayer technology in high-k materials

PubMed Central

Wang, Xiao-Dong; Chen, Bo; Wang, Hai-Feng; He, Fei; Zheng, Xin; He, Ling-Ping; Chen, Bin; Liu, Shi-Jie; Cui, Zhong-Xu; Yang, Xiao-Hu; Li, Yun-Peng

2015-01-01

Application of π-multilayer technology is extended to high extinction coefficient materials, which is introduced into metal-dielectric filter design. Metal materials often have high extinction coefficients in far ultraviolet (FUV) region, so optical thickness of metal materials should be smaller than that of the dielectric material. A broadband FUV filter of 9-layer non-periodic Al/MgF2 multilayer was successfully designed and fabricated and it shows high reflectance in 140–180 nm, suppressed reflectance in 120–137 nm and 181–220 nm. PMID:25687255

19 CFR Appendix A to Part 191 - General Manufacturing Drawback Rulings

Code of Federal Regulations, 2010 CFR

2010-04-01

... manufacture or production. B. These general manufacturing drawback rulings supersede general “contracts... manufacturing drawback rulings which have been designed to simplify drawback procedures. Any person who can... drawback; and 9. Description of the manufacturing or production process, unless specifically described in...

50 CFR 424.20 - Emergency rules.

Code of Federal Regulations, 2010 CFR

2010-10-01

... OF COMMERCE); ENDANGERED SPECIES COMMITTEE REGULATIONS SUBCHAPTER A LISTING ENDANGERED AND THREATENED SPECIES AND DESIGNATING CRITICAL HABITAT Revision of the Lists § 424.20 Emergency rules. (a) Sections 424...-being of a species of fish, wildlife, or plant. Such rules shall, at the discretion of the Secretary...

50 CFR 424.20 - Emergency rules.

Code of Federal Regulations, 2014 CFR

2014-10-01

... OF COMMERCE); ENDANGERED SPECIES COMMITTEE REGULATIONS SUBCHAPTER A LISTING ENDANGERED AND THREATENED SPECIES AND DESIGNATING CRITICAL HABITAT Revision of the Lists § 424.20 Emergency rules. (a) Sections 424...-being of a species of fish, wildlife, or plant. Such rules shall, at the discretion of the Secretary...

50 CFR 424.18 - Final rules-general.

Code of Federal Regulations, 2011 CFR

2011-10-01

... OF COMMERCE); ENDANGERED SPECIES COMMITTEE REGULATIONS SUBCHAPTER A LISTING ENDANGERED AND THREATENED SPECIES AND DESIGNATING CRITICAL HABITAT Revision of the Lists § 424.18 Final rules—general. (a) Contents... any conservation measures available under the rule. Publication of a final rule to list, delist, or...

50 CFR 424.20 - Emergency rules.

Code of Federal Regulations, 2011 CFR

2011-10-01

... OF COMMERCE); ENDANGERED SPECIES COMMITTEE REGULATIONS SUBCHAPTER A LISTING ENDANGERED AND THREATENED SPECIES AND DESIGNATING CRITICAL HABITAT Revision of the Lists § 424.20 Emergency rules. (a) Sections 424...-being of a species of fish, wildlife, or plant. Such rules shall, at the discretion of the Secretary...

50 CFR 424.20 - Emergency rules.

Code of Federal Regulations, 2012 CFR

2012-10-01

... OF COMMERCE); ENDANGERED SPECIES COMMITTEE REGULATIONS SUBCHAPTER A LISTING ENDANGERED AND THREATENED SPECIES AND DESIGNATING CRITICAL HABITAT Revision of the Lists § 424.20 Emergency rules. (a) Sections 424...-being of a species of fish, wildlife, or plant. Such rules shall, at the discretion of the Secretary...

A knowledge authoring tool for clinical decision support.

PubMed

Dunsmuir, Dustin; Daniels, Jeremy; Brouse, Christopher; Ford, Simon; Ansermino, J Mark

2008-06-01

Anesthesiologists in the operating room are unable to constantly monitor all data generated by physiological monitors. They are further distracted by clinical and educational tasks. An expert system would ideally provide assistance to the anesthesiologist in this data-rich environment. Clinical monitoring expert systems have not been widely adopted, as traditional methods of knowledge encoding require both expert medical and programming skills, making knowledge acquisition difficult. A software application was developed for use as a knowledge authoring tool for physiological monitoring. This application enables clinicians to create knowledge rules without the need of a knowledge engineer or programmer. These rules are designed to provide clinical diagnosis, explanations and treatment advice for optimal patient care to the clinician in real time. By intelligently combining data from physiological monitors and demographical data sources the expert system can use these rules to assist in monitoring the patient. The knowledge authoring process is simplified by limiting connective relationships between rules. The application is designed to allow open collaboration between communities of clinicians to build a library of rules for clinical use. This design provides clinicians with a system for parameter surveillance and expert advice with a transparent pathway of reasoning. A usability evaluation demonstrated that anesthesiologists can rapidly develop useful rules for use in a predefined clinical scenario.

Development of Design Rules for Reliable Antisense RNA Behavior in E. coli.

PubMed

Hoynes-O'Connor, Allison; Moon, Tae Seok

2016-12-16

A key driver of synthetic biology is the development of designable genetic parts with predictable behaviors that can be quickly implemented in complex genetic systems. However, the intrinsic complexity of gene regulation can make the rational design of genetic parts challenging. This challenge is apparent in the design of antisense RNA (asRNA) regulators. Though asRNAs are well-known regulators, the literature governing their design is conflicting and leaves the synthetic biology community without clear asRNA design rules. The goal of this study is to perform a comprehensive experimental characterization and statistical analysis of 121 unique asRNA regulators in order to resolve the conflicts that currently exist in the literature. asRNAs usually consist of two regions, the Hfq binding site and the target binding region (TBR). First, the behaviors of several high-performing Hfq binding sites were compared, in terms of their ability to improve repression efficiencies and their orthogonality. Next, a large-scale analysis of TBR design parameters identified asRNA length, the thermodynamics of asRNA-mRNA complex formation, and the percent of target mismatch as key parameters for TBR design. These parameters were used to develop simple asRNA design rules. Finally, these design rules were applied to construct both a simple and a complex genetic circuit containing different asRNAs, and predictable behavior was observed in both circuits. The results presented in this study will drive synthetic biology forward by providing useful design guidelines for the construction of asRNA regulators with predictable behaviors.

Wide-Spectrum Microscope with a Long Working Distance Aspherical Objective Based on Obscuration Constraint

PubMed Central

Wang, Weibo; Wang, Chao; Liu, Jian; Tan, Jiubin

2016-01-01

We present an approach for an initial configuration design based on obscuration constraint and on-axis Taylor series expansion to realize the design of long working distance microscope (numerical aperture (NA) = 0.13 and working distance (WD) = 525 mm) with a low obscuration aspherical Schwarzschild objective in wide-spectrum imaging (λ = 400–900 nm). Experiments of the testing on the resolution target and inspection on United States Air Force (USAF) resolution chart and a line charge-coupled device (CCD) (pixel size of 14 μm × 56 μm) with different wavelength light sources (λ = 480 nm, 550 nm, 660 nm, 850 nm) were implemented to verify the validity of the proposed method. PMID:27834874

Habitability design elements for a space station

NASA Technical Reports Server (NTRS)

Dalton, M. C.

1983-01-01

Habitability in space refers to the components, characteristics, conditions, and design parameters that go beyond but include the basic life sustaining requirements. Elements of habitability covered include internal environment, architecture, mobility and restraint, food, clothing, personal hygiene, housekeeping, communications, and crew activities. All elements are interrelated and need to be treated as an overall discipline. Designing for a space station is similar to designing on earth but with 'space rules' instead of ground rules. It is concluded that some habitability problems require behavioral science solutions.

Ultrashort broadband polarization beam splitter based on a combined hybrid plasmonic waveguide.

PubMed

Chang, Ken-Wei; Huang, Chia-Chien

2016-01-20

We propose an ultracompact broadband polarization beam splitter (PBS) based on a combined hybrid plasmonic waveguide (HPW). The proposed PBS separates transverse-electric (TE) and transverse-magnetic (TM) modes using a bent lower HPW with vertical nanoscale gaps and a straight upper HPW with a horizontal nanoscale gap, respectively, without relying on an additional coupling region. This design considerably reduces the length of the PBS to the submicron scale (920 nm, the shortest PBS reported to date) while offering polarization extinction ratios (PERs) of ~19 dB (~18 dB) and insertion losses (ILs) of ~0.6 dB (~0.3 dB) for the TE (TM) mode over an extremely broad band of 400 nm (from λ = 1300 nm to 1700 nm, covering entirely second and third telecom windows). The length of the designed PBS can be reduced further to 620 nm while still offering PERs of 15 dB, realizing a densely photonic integrated circuit. Considering the fabrication tolerance, the designed PBS allows for large geometrical deviations of ± 20 nm while restricting PER variations to within 1 dB, except for those in the nanoscale gaps smaller than 10nm. Additionally, we also address the input and ouput coupling efficiencies of the proposed PBS.

Connector interchangeability

NASA Technical Reports Server (NTRS)

Berilla, T.

1972-01-01

The application is discussed of the general rules of ANSI Y14.5 in designing connectors for interchangeability, and lowering costs. The general rules are applied to actural connector designs, and existing specifications are identified that (1) reject better quality products than those accepted, (2) accept products which should be rejected, and (3) impose unnecessary, nonfunctional costly requirements.

77 FR 22042 - Self-Regulatory Organizations; The NASDAQ Stock Market LLC; Notice of Filing of Proposed Rule...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-04-12

... investor confidence and market integrity, the Exchange designed the MQP Program to be highly transparent...), respectively. Background The proposed Market Quality Program is a voluntary program designed to promote market... obligations of listed Companies. The Rule 5300, 5400, and 5500 Series contain the specific quantitative...

77 FR 68181 - Self-Regulatory Organizations; Financial Industry Regulatory Authority, Inc.; Notice of Filing...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-11-15

... FINRA rules must be designed to prevent fraudulent and manipulative acts and practices, to promote just... which may be distributed or published by any member or person associated with a member, and the persons... such rules be designed to produce fair and informative quotations, to prevent fictitious or misleading...

78 FR 69487 - Self-Regulatory Organizations; Chicago Board Options Exchange, Incorporated; Notice of Filing of...

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2013-11-19

... investigate illegal activity in a more timely fashion. The Exchange also believes that the proposed rule... an exchange be designed to prevent fraudulent and manipulative acts and practices, to promote just...\\ requirement that the rules of an exchange not be designed to permit unfair discrimination between customers...

76 FR 51442 - Self-Regulatory Organizations; NYSE Arca, Inc.; Notice of Filing of Proposed Rule Change To List...

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2011-08-18

...-Adviser has designed the following quantitative stock selection rules to make allocation decisions and to..., the Sub-Adviser's investment process is quantitative. Based on extensive historical research, the Sub... open-end fund's portfolio composition must be subject to procedures designed to prevent the use and...

78 FR 60347 - Self-Regulatory Organizations; National Securities Clearing Corporation; Notice of Designation of...

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2013-10-01

... by Amendment Nos. 1 and 2, To Institute Supplemental Liquidity Deposits to Its Clearing Funding Designed To Increase Liquidity Resources To Meet Its Liquidity Needs September 25, 2013. On March 21, 2013... Rule 19b-4 thereunder,\\2\\ a proposed rule change to institute supplemental liquidity deposits to its...

17 CFR 41.49 - Filing proposed margin rule changes with the Commission.

Code of Federal Regulations, 2010 CFR

2010-04-01

... registered with the Commission as a designated contract market under section 5 of the Act or a derivatives... contract markets. Any self-regulatory authority that is registered with the Commission as a designated contract market under section 5f of the Act shall, when filing a proposed rule change regarding customer...

Laser spectroscopy of the 5P3/2 → 6Pj (j = 1/2 and 3/2) electric dipole forbidden transitions in atomic rubidium

NASA Astrophysics Data System (ADS)

Ponciano-Ojeda, F.; Hernández-Gómez, S.; Mojica-Casique, C.; Hoyos, L. M.; Flores-Mijangos, J.; Ramírez-Martínez, F.; Sahagún, D.; Jáuregui, R.; Jiménez-Mier, J.

2018-04-01

Doppler-free optical double-resonance spectroscopy is used to study the 5S1/2 → 5P3/2 → 6Pj (j = 3/2,1/2) excitation sequence in room-temperature rubidium atoms. This involves a 5S1/2 → 5P3/2 electric dipole preparation step followed by the 5P3/2 → 6Pj electric quadrupole excitation. The electric dipole forbidden transitions occur at 911.0 nm (j = 3/2) and 917.5 nm (j = 1/2). Production of atoms in the 6Pj states is detected by observing their direct decay to the ground state through emission of blue photons (λ ≈ 420 nm). A detailed experimental and theoretical study of the dependence on the relative linear polarizations of excitation beams is made. It is shown that specific electric quadrupole selection rules over magnetic quantum numbers are directly related to the relative orientation of the linear polarization of the excitation beams.

Exploring the combinatorial space of complete pathways to chemicals.

PubMed

Wang, Lin; Ng, Chiam Yu; Dash, Satyakam; Maranas, Costas D

2018-04-06

Computational pathway design tools often face the challenges of balancing the stoichiometry of co-metabolites and cofactors, and dealing with reaction rule utilization in a single workflow. To this end, we provide an overview of two complementary stoichiometry-based pathway design tools optStoic and novoStoic developed in our group to tackle these challenges. optStoic is designed to determine the stoichiometry of overall conversion first which optimizes a performance criterion (e.g. high carbon/energy efficiency) and ensures a comprehensive search of co-metabolites and cofactors. The procedure then identifies the minimum number of intervening reactions to connect the source and sink metabolites. We also further the pathway design procedure by expanding the search space to include both known and hypothetical reactions, represented by reaction rules, in a new tool termed novoStoic. Reaction rules are derived based on a mixed-integer linear programming (MILP) compatible reaction operator, which allow us to explore natural promiscuous enzymes, engineer candidate enzymes that are not already promiscuous as well as design de novo enzymes. The identified biochemical reaction rules then guide novoStoic to design routes that expand the currently known biotransformation space using a single MILP modeling procedure. We demonstrate the use of the two computational tools in pathway elucidation by designing novel synthetic routes for isobutanol. © 2018 The Author(s). Published by Portland Press Limited on behalf of the Biochemical Society.

Working draft of the FDA GMP final rule (Part II).

PubMed

Donawa, M E

1995-11-01

Part I of this two-part series provided information on the proposed design control provisions of the US Food and Drug Administration's (FDA) working draft of the final rule for new good manufacturing practice regulations for medical devices. The final rule could be published in April or May 1996. It would be in force 180 days after the date of publication. Design control requirements may become effective some months later. This article describes recommended modifications of three provisions that have been intensely discussed during recent FDA-sponsored public meetings.

Designing Rules for Accounting Transaction Identification based on Indonesian NLP

NASA Astrophysics Data System (ADS)

Iswandi, I.; Suwardi, I. S.; Maulidevi, N. U.

2017-03-01

Recording accounting transactions carried out by the evidence of the transactions. It can be invoices, receipts, letters of intent, electricity bill, telephone bill, etc. In this paper, we proposed design of rules to identify the entities located on the sales invoice. There are some entities identified in a sales invoice, namely : invoice date, company name, invoice number, product id, product name, quantity and total price. Identification this entities using named entity recognition method. The entities generated from the rules used as a basis for automation process of data input into the accounting system.

75 FR 14072 - Safety Zones; March Fireworks Displays Within the Captain of the Port Puget Sound Area of...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-03-24

... this rule because it is contrary to public interest to delay the effective date of this rule. Delaying... of the Port, Puget Sound or Designated Representative. DATES: Effective Date: this rule is effective in the CFR from March 24, 2010 until 12:01 a.m. March 28, 2010. This rule is effective with actual...

78 FR 51909 - Broker-Dealer Reports

Federal Register 2010, 2011, 2012, 2013, 2014

2013-08-21

... customer accounts to agree to allow representatives of the Commission or the broker-dealer's designated... custody of securities and funds of customers and non-customers. DATES: This rule is effective June 1, 2014...-Dealer Net Capital Rule 2. The Broker-Dealer Customer Protection Rule 3. The Broker-Dealer Quarterly...

OSHA Final Rule Gives Employees the Right to See Their Exposure and Medical Records.

ERIC Educational Resources Information Center

Hayes, Mary

1982-01-01

Provides details pertaining to the Occupational Safety and Health Administration (OSHA) ruling that gives employees, their designated representatives, and OSHA the right to examine their on-the-job medical records. Discusses the effects the ruling may have on organizations. (Author/MLF)

50 CFR 424.16 - Proposed rules.

Code of Federal Regulations, 2012 CFR

2012-10-01

... OF COMMERCE); ENDANGERED SPECIES COMMITTEE REGULATIONS SUBCHAPTER A LISTING ENDANGERED AND THREATENED SPECIES AND DESIGNATING CRITICAL HABITAT Revision of the Lists § 424.16 Proposed rules. (a) General. Based...—(1) Notifications. In the case of any proposed rule to list, delist, or reclassify a species, or to...

Long-term study of urban ultrafine particles and other pollutants

NASA Astrophysics Data System (ADS)

Wang, Yungang; Hopke, Philip K.; Chalupa, David C.; Utell, Mark J.

2011-12-01

Continuous measurements of number size distributions of ultrafine particles (UFPs) and other pollutants (PM 2.5, SO 2, CO and O 3) have been performed in Rochester, New York since late November 2001. The 2002-2009 average number concentrations of particles in three size ranges (10-50 nm, 50-100 nm and 100-500 nm) were 4730 cm -3, 1838 cm -3, and 1073 cm -3, respectively. The lowest annual average number concentrations of particles in 10-50 nm and 50-100 nm were observed during 2008-2009. The lowest monthly average number concentration of 10-50 nm particles was observed in July and the highest in February. The daily patterns of 10-50 nm particles had two peaks at early morning (7-8 AM) and early afternoon (2 PM). There was a distinct declining trend in the peak number concentrations from 2002-2005 to 2008-2009. Large reductions in SO 2 concentrations associated with northerly winds between 2007 and 2009 were observed. The most significant annual decrease in the frequency of morning particle nucleation was observed from 2005 to 2007. The monthly variation in the morning nucleation events showed a close correlation with number concentrations of 10-50 nm particles ( r = 0.89). The frequency of the local SO 2-related nucleation events was much higher before 2006. All of these results suggest significant impacts of highway traffic and industrial sources. The decrease in particle number concentrations and particle nucleation events likely resulted from a combination of the U.S. EPA 2007 Heavy-Duty Highway Rule implemented on October 1, 2006, the closure of a large coal-fired power plant in May 2008, and the reduction of Eastman Kodak emissions.

Ada Structure Design Language (ASDL)

NASA Technical Reports Server (NTRS)

Chedrawi, Lutfi

1986-01-01

An artist acquires all the necessary tools before painting a scene. In the same analogy, a software engineer needs the necessary tools to provide their design with the proper means for implementation. Ada provide these tools. Yet, as an artist's painting needs a brochure to accompany it for further explanation of the scene, an Ada design also needs a document along with it to show the design in its detailed structure and hierarchical order. Ada could be self-explanatory in small programs not exceeding fifty lines of code in length. But, in a large environment, ranging from thousands of lines and above, Ada programs need to be well documented to be preserved and maintained. The language used to specify an Ada document is called Ada Structure Design Language (ASDL). This language sets some rules to help derive a well formatted Ada detailed design document. The rules are defined to meet the needs of a project manager, a maintenance team, a programmer and a systems designer. The design document templates, the document extractor, and the rules set forth by the ASDL are explained in detail.

Performance Analysis of Hybrid WDM-FSO System under Various Weather Conditions

NASA Astrophysics Data System (ADS)

Robinson, S.; Jasmine, S.

2016-09-01

Free Space Optical (FSO) communication is being realized as an effective solution for future accessing networks, offering light passed through air. The performance of FSO system can be primarily degraded by various atmospheric attenuations such as rain, fog, haze and snow. At present, hybridization of Dense Wavelength Division Multiplexing (DWDM) with Coarse Wavelength Division Multiplexing (CWDM) becomes necessary to scale the speed and high bandwidth of the services. In this paper, primarily the attenuation values for different weather conditions are calculated. Then the hybrid WDM-FSO system is proposed, designed and the network parameters such as Bit Error Rate (BER), Quality factor (Q factor) and receiver sensitivity are analyzed with respect to link distance for various weather conditions. For investigation, four CWDM (1,510 nm, 1,530 nm, 1,570 nm and 1,570 nm) channel and eight DWDM channels (1,537.4 nm, 1,538.2 nm, 1,539 nm, 1,539.8 nm, 1,540.6 nm, 1,541.4 nm, 1,542.2 nm and 1,543 nm) are considered whose corresponding channel spacing is 20 nm and 0.8 nm, respectively. In addition, the Erbium Doped Fiber Amplifier (EDFA) is inserted at the receiver end in order to enhance the link distance. The proposed hybrid WDM-FSO system is designed to handle the quality of transmission for 12 users, each at a data rate of 2.5 Gbps along an FSO link distance of about 960 km.

Optical extinction efficiency measurements on fine and accumulation mode aerosol using single particle cavity ring-down spectroscopy.

PubMed

Cotterell, Michael I; Mason, Bernard J; Preston, Thomas C; Orr-Ewing, Andrew J; Reid, Jonathan P

2015-06-28

A new experiment is presented for the measurement of single aerosol particle extinction efficiencies, Qext, combining cavity ring-down spectroscopy (CRDS, λ = 405 nm) with a Bessel beam trap (λ = 532 nm) in tandem with phase function (PF) measurements. This approach allows direct measurements of the changing optical cross sections of individual aerosol particles over indefinite time-frames facilitating some of the most comprehensive measurements of the optical properties of aerosol particles so far made. Using volatile 1,2,6-hexanetriol droplets, Qext is measured over a continuous radius range with the measured Qext envelope well described by fitted cavity standing wave (CSW) Mie simulations. These fits allow the refractive index at 405 nm to be determined. Measurements are also presented of Qext variation with RH for two hygroscopic aqueous inorganic systems ((NH4)2SO4 and NaNO3). For the PF and the CSW Mie simulations, the refractive index, nλ, is parameterised in terms of the particle radius. The radius and refractive index at 532 nm are determined from PFs, while the refractive index at 405 nm is determined by comparison of the measured Qext to CSW Mie simulations. The refractive indices determined at the shorter wavelength are larger than at the longer wavelength consistent with the expected dispersion behaviour. The measured values at 405 nm are compared to estimates from volume mixing and molar refraction mixing rules, with the latter giving superior agreement. In addition, the first single-particle Qext measurements for accumulation mode aerosol are presented for droplets with radii as small as ∼300 nm.

Realization of planning design of mechanical manufacturing system by Petri net simulation model

NASA Astrophysics Data System (ADS)

Wu, Yanfang; Wan, Xin; Shi, Weixiang

1991-09-01

Planning design is to work out a more overall long-term plan. In order to guarantee a mechanical manufacturing system (MMS) designed to obtain maximum economical benefit, it is necessary to carry out a reasonable planning design for the system. First, some principles on planning design for MMS are introduced. Problems of production scheduling and their decision rules for computer simulation are presented. Realizable method of each production scheduling decision rule in Petri net model is discussed. Second, the solution of conflict rules for conflict problems during running Petri net is given. Third, based on the Petri net model of MMS which includes part flow and tool flow, according to the principle of minimum event time advance, a computer dynamic simulation of the Petri net model, that is, a computer dynamic simulation of MMS, is realized. Finally, the simulation program is applied to a simulation exmple, so the scheme of a planning design for MMS can be evaluated effectively.

Topology optimized gold nanostrips for enhanced near-infrared photon upconversion

NASA Astrophysics Data System (ADS)

Vester-Petersen, Joakim; Christiansen, Rasmus E.; Julsgaard, Brian; Balling, Peter; Sigmund, Ole; Madsen, Søren P.

2017-09-01

This letter presents a topology optimization study of metal nanostructures optimized for electric-field enhancement in the infrared spectrum. Coupling of such nanostructures with suitable ions allows for an increased photon-upconversion yield, with one application being an increased solar-cell efficiency by exploiting the long-wavelength part of the solar spectrum. In this work, topology optimization is used to design a periodic array of two-dimensional gold nanostrips for electric-field enhancements in a thin film doped with upconverting erbium ions. The infrared absorption band of erbium is utilized by simultaneously optimizing for two polarizations, up to three wavelengths, and three incident angles. Geometric robustness towards manufacturing variations is implemented considering three different design realizations simultaneously in the optimization. The polarization-averaged field enhancement for each design is evaluated over an 80 nm wavelength range and a ±15-degree incident angle span. The highest polarization-averaged field enhancement is 42.2 varying by maximally 2% under ±5 nm near-uniform design perturbations at three different wavelengths (1480 nm, 1520 nm, and 1560 nm). The proposed method is generally applicable to many optical systems and is therefore not limited to enhancing photon upconversion.

Redundancy checking algorithms based on parallel novel extension rule

NASA Astrophysics Data System (ADS)

Liu, Lei; Yang, Yang; Li, Guangli; Wang, Qi; Lü, Shuai

2017-05-01

Redundancy checking (RC) is a key knowledge reduction technology. Extension rule (ER) is a new reasoning method, first presented in 2003 and well received by experts at home and abroad. Novel extension rule (NER) is an improved ER-based reasoning method, presented in 2009. In this paper, we first analyse the characteristics of the extension rule, and then present a simple algorithm for redundancy checking based on extension rule (RCER). In addition, we introduce MIMF, a type of heuristic strategy. Using the aforementioned rule and strategy, we design and implement RCHER algorithm, which relies on MIMF. Next we design and implement an RCNER (redundancy checking based on NER) algorithm based on NER. Parallel computing greatly accelerates the NER algorithm, which has weak dependence among tasks when executed. Considering this, we present PNER (parallel NER) and apply it to redundancy checking and necessity checking. Furthermore, we design and implement the RCPNER (redundancy checking based on PNER) and NCPPNER (necessary clause partition based on PNER) algorithms as well. The experimental results show that MIMF significantly influences the acceleration of algorithm RCER in formulae on a large scale and high redundancy. Comparing PNER with NER and RCPNER with RCNER, the average speedup can reach up to the number of task decompositions when executed. Comparing NCPNER with the RCNER-based algorithm on separating redundant formulae, speedup increases steadily as the scale of the formulae is incrementing. Finally, we describe the challenges that the extension rule will be faced with and suggest possible solutions.

Diffraction efficiency growth of nano-scale holographic recording produced in a corona discharge

NASA Astrophysics Data System (ADS)

Bodurov, I.; Yovcheva, T.; Vlaeva, I.; Viraneva, A.; Todorov, R.; Spassov, G.; Sainov, S.

2012-12-01

The nano-scale holographic gratings ware recorded in 29 nm and 56 nm thick As2S3 films. The chalcogenide layers were deposited on a transparent chromium electrode with thickness 10 nm, produced on a glass substrate. Both chromium and chalcogenide films were deposited in one vacuum cycle by e-beam and thermal evaporation, respectively. The diode 532 nm diode laser was used as a light source in the present holographic experiments. The total internal reflection arrangement (Stetson-Nassenstein) was used in holographic recordings. The reference beam was totally reflected from the air-As2S3 boundary surface by an input glass prism. The object beam was normally incident on the recording medium. The corona charging was performed by a needle fixed at the distance of 1 cm from the holographic recording medium by applying a - 5 kV voltage. The diffraction efficiency increased from 9 to 30 times when the corona discharge was applied during the holographic recording, in comparison to the uncharged recording. The possible reason of the observed effect is discussed on the basis of the Franz-Keldysh effect and Moss rule.

REBL: design progress toward 16 nm half-pitch maskless projection electron beam lithography

NASA Astrophysics Data System (ADS)

McCord, Mark A.; Petric, Paul; Ummethala, Upendra; Carroll, Allen; Kojima, Shinichi; Grella, Luca; Shriyan, Sameet; Rettner, Charles T.; Bevis, Chris F.

2012-03-01

REBL (Reflective Electron Beam Lithography) is a novel concept for high speed maskless projection electron beam lithography. Originally targeting 45 nm HP (half pitch) under a DARPA funded contract, we are now working on optimizing the optics and architecture for the commercial silicon integrated circuit fabrication market at the equivalent of 16 nm HP. The shift to smaller features requires innovation in most major subsystems of the tool, including optics, stage, and metrology. We also require better simulation and understanding of the exposure process. In order to meet blur requirements for 16 nm lithography, we are both shrinking the pixel size and reducing the beam current. Throughput will be maintained by increasing the number of columns as well as other design optimizations. In consequence, the maximum stage speed required to meet wafer throughput targets at 16 nm will be much less than originally planned for at 45 nm. As a result, we are changing the stage architecture from a rotary design to a linear design that can still meet the throughput requirements but with more conventional technology that entails less technical risk. The linear concept also allows for simplifications in the datapath, primarily from being able to reuse pattern data across dies and columns. Finally, we are now able to demonstrate working dynamic pattern generator (DPG) chips, CMOS chips with microfabricated lenslets on top to prevent crosstalk between pixels.

VUV spectroscopy in impurity injection experiments at KSTAR using prototype ITER VUV spectrometer.

PubMed

Seon, C R; Hong, J H; Song, I; Jang, J; Lee, H Y; An, Y H; Kim, B S; Jeon, T M; Park, J S; Choe, W; Lee, H G; Pak, S; Cheon, M S; Choi, J H; Kim, H S; Biel, W; Bernascolle, P; Barnsley, R

2017-08-01

The ITER vacuum ultra-violet (VUV) core survey spectrometer has been designed as a 5-channel spectral system so that the high spectral resolving power of 200-500 could be achieved in the wavelength range of 2.4-160 nm. To verify the design of the ITER VUV core survey spectrometer, a two-channel prototype spectrometer was developed. As a subsequent step of the prototype test, the prototype VUV spectrometer has been operated at KSTAR since the 2012 experimental campaign. From impurity injection experiments in the years 2015 and 2016, strong emission lines, such as Kr xxv 15.8 nm, Kr xxvi 17.9 nm, Ne vii 46.5 nm, Ne vi 40.2 nm, and an array of largely unresolved tungsten lines (14-32 nm) could be measured successfully, showing the typical photon number of 10 13 -10 15 photons/cm 2 s.

Integration of GaAs-based VCSEL array on SiN platform with HCG reflectors for WDM applications

NASA Astrophysics Data System (ADS)

Kumari, Sulakshna; Gustavsson, Johan S.; Wang, Ruijun; Haglund, Emanuel P.; Westbergh, Petter; Sanchez, Dorian; Haglund, Erik; Haglund, Åsa; Bengtsson, Jörgen; Le Thomas, Nicolas; Roelkens, Gunther; Larsson, Anders; Baets, Roel

2015-02-01

We present a GaAs-based VCSEL structure, BCB bonded to a Si3N4 waveguide circuit, where one DBR is substituted by a free-standing Si3N4 high-contrast-grating (HCG) reflector realized in the Si3N4 waveguide layer. This design enables solutions for on-chip spectroscopic sensing, and the dense integration of 850-nm WDM data communication transmitters where individual channel wavelengths are set by varying the HCG parameters. RCWA shows that a 300nm-thick Si3N4 HCG with 800nm period and 40% duty cycle reflects strongly (<99%) over a 75nm wavelength range around 850nm. A design with a standing-optical-field minimum at the III-V/airgap interface maximizes the HCG's influence on the VCSEL wavelength, allowing for a 15-nm-wide wavelength setting range with low threshold gain (<1000 cm-1).

Way for LEEPL technology to succeed in memory device application

NASA Astrophysics Data System (ADS)

Kim, In-Sung; Woo, Sang-Gyun; Cho, Han-Ku; Han, Woo-Sung; Moon, Joo-Tae

2004-05-01

Lithography for 65nm-node device is drawing a lot of attentions these days especially because lithography solution for this node is not clear and even tool makers tend to wait for the consensus in lithography roadmap to avoid the risk of erroneous amount of investment. Recently proposed concept of low energy electron-beam proximity-projection lithography (LEEPL)1,2 technology has already released its first production machine in 2003, which is being expected to cover the design rule down to 65nm-node and even smaller3. Although production of semiconductor device has been pursuing optical lithography, without any optical technology that is proved as a convincing solution for 65nm node and below, we need to take account of all the candidates. So we made an investigation on LEEPL technology and evaluated beta and first production tool to see the feasibility of printing sub-70nm resolution and of optic-first mix-and-match overlay from a chip maker"s point of view. Two different kinds of stencil masks were fabricated for the evaluation, which are fabricated in SiC and Si membrane. The former mask is for sparse contact holes(C/H) and the latter for dense C/Hs. Beta-tool showed a good resolving power of sub-70nm sparse C/Hs of SRAM with negligibly small proximity effect. It implies that LEEPL does not require much effort for proximity correction comparing to that required in optical lithography, which is one of the biggest issues in low-k1. LEEPL also showed a good capability of optic-first mix-and-match overlay correction and this is the most stringent and important functionality for optic-first mix-and-match application. However random intra-membrane image placement(IP) error that is a little bit larger than the requirement for sub-70nm node was observed, which is interpreted to come from the larger stress of 100MPa in 3X3mm2 dry-etched SiC unit membrane. For dense C/Hs, we failed, to the contrary, to obtain any good quality of stencil masks for DRAM cell patterns because of e-beam proximity effect which is unavoidable in the reversed order of front-side forward direct writing and back-side later membrane formation. Pros and cons of LEEPL technology are discussed based on the evaluation results and estimation from the memory device standpoint. We also propose a novel concept of stencil mask that can be helpful in memory device application.

Proposal to designate the order Actinomycetales Buchanan 1917, 162 (Approved Lists 1980) as the nomenclatural type of the class Actinobacteria. Request for an Opinion

PubMed Central

2017-01-01

The name of the class Actinobacteria is illegitimate according to Rules 15, 22 and 27(3) because it was proposed without the designation of a nomenclatural type. I therefore propose to designate the order Actinomycetales Buchanan 1917, 162 (Approved Lists 1980) as its nomenclatural type, based on Rule 22 of the International Code of Nomenclature of Prokaryotes. PMID:28840812

Proposal to designate the order Actinomycetales Buchanan 1917, 162 (Approved Lists 1980) as the nomenclatural type of the class Actinobacteria. Request for an Opinion.

PubMed

Oren, Aharon

2017-09-01

The name of the class Actinobacteria is illegitimate according to Rules 15, 22 and 27(3) because it was proposed without the designation of a nomenclatural type. I therefore propose to designate the order Actinomycetales Buchanan 1917, 162 (Approved Lists 1980) as its nomenclatural type, based on Rule 22 of the International Code of Nomenclature of Prokaryotes.

A Simple Model of Circuit Design.

DTIC Science & Technology

1980-05-01

mathematicians who discover mathematical ideas (i.cnat>, programmers who write code <Manna> <Barstow>, physicists who solve mechanics problems <de Kiecr-l...rules and shows how - they result in the design of circuits. ’l’he design rules must not only capture the purely mathematical constralints given by VICs...K VI.. *? and KCI, but also how those constraints can implement mechanism. Mathematical constraints tell us an amplifier’s input and output voltages

Low-loss compact multilayer silicon nitride platform for 3D photonic integrated circuits.

PubMed

Shang, Kuanping; Pathak, Shibnath; Guan, Binbin; Liu, Guangyao; Yoo, S J B

2015-08-10

We design, fabricate, and demonstrate a silicon nitride (Si(3)N(4)) multilayer platform optimized for low-loss and compact multilayer photonic integrated circuits. The designed platform, with 200 nm thick waveguide core and 700 nm interlayer gap, is compatible for active thermal tuning and applicable to realizing compact photonic devices such as arrayed waveguide gratings (AWGs). We achieve ultra-low loss vertical couplers with 0.01 dB coupling loss, multilayer crossing loss of 0.167 dB at 90° crossing angle, 50 μm bending radius, 100 × 2 μm(2) footprint, lateral misalignment tolerance up to 400 nm, and less than -52 dB interlayer crosstalk at 1550 nm wavelength. Based on the designed platform, we demonstrate a 27 × 32 × 2 multilayer star coupler.

Structure and photoluminescence studies of CeO2·CuAlO2 mixed metal oxide fabricated by co-precipitation method.

PubMed

Subhan, Md Abdus; Ahmed, Tanzir; Awal, M R; Kim, B Moon

2015-01-25

A novel mixed metal oxide, CeO2·CuAlO2 was fabricated by co-precipitation method in aqueous medium. CeO2·CuAlO2 was characterized by XRD, SEM, EDS, TEM, FTIR and PL spectra. The optical properties of the nanoparticles were studied by photoluminescence (PL) spectra. PL spectra at different excitations were recorded. The composite showed emission in UV, visible and NIR region depending on the excitation wavelength. The special spectral feature observed for this composite is that it showed six emission bands at 364, 409, 434, 448, 465 and 481 nm when excited at 298 nm. The green and red emissions observed at 512 and 669 nm are originated from cubic CeO2 phase when excited at 450 nm. The PL spectra were found to be dependent on excitation wavelength violating Kasha's rule. The X-ray diffraction reveals a cubic CeO2 phase and hexagonal CuAlO2 phase. EDS spectra revealed the presence of cerium (Ce), copper (Cu), aluminum (Al) and oxygen (O) elements. The particle size of the CeO2·CuAlO2 mixed oxide was estimated using Scherrer's formula, which was found to be in the range of 17.2-34.2 nm. The TEM image showed particles are almost uniform size of approximately 15-50 nm with spherical morphology. Copyright © 2014 Elsevier B.V. All rights reserved.

Structure and photoluminescence studies of CeO2·CuAlO2 mixed metal oxide fabricated by co-precipitation method

NASA Astrophysics Data System (ADS)

Subhan, Md Abdus; Ahmed, Tanzir; Awal, M. R.; Kim, B. Moon

2015-01-01

A novel mixed metal oxide, CeO2·CuAlO2 was fabricated by co-precipitation method in aqueous medium. CeO2·CuAlO2 was characterized by XRD, SEM, EDS, TEM, FTIR and PL spectra. The optical properties of the nanoparticles were studied by photoluminescence (PL) spectra. PL spectra at different excitations were recorded. The composite showed emission in UV, visible and NIR region depending on the excitation wavelength. The special spectral feature observed for this composite is that it showed six emission bands at 364, 409, 434, 448, 465 and 481 nm when excited at 298 nm. The green and red emissions observed at 512 and 669 nm are originated from cubic CeO2 phase when excited at 450 nm. The PL spectra were found to be dependent on excitation wavelength violating Kasha's rule. The X-ray diffraction reveals a cubic CeO2 phase and hexagonal CuAlO2 phase. EDS spectra revealed the presence of cerium (Ce), copper (Cu), aluminum (Al) and oxygen (O) elements. The particle size of the CeO2·CuAlO2 mixed oxide was estimated using Scherrer's formula, which was found to be in the range of 17.2-34.2 nm. The TEM image showed particles are almost uniform size of approximately 15-50 nm with spherical morphology.

78 FR 25388 - Significant New Use Rule on Ethoxylated, Propoxylated Diamine Diaryl Substituted Phenylmethane...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-05-01

...). ACTION: Final rule. SUMMARY: EPA is finalizing a significant new use rule (SNUR) under the Toxic Substances Control Act (TSCA) for the chemical substance identified generically as ethoxylated, propoxylated... manufacture, import, or process this chemical substance for an activity that is designated as a significant...

Implicit and Explicit Instruction of Spelling Rules

ERIC Educational Resources Information Center

Kemper, M. J.; Verhoeven, L.; Bosman, A. M. T.

2012-01-01

The study aimed to compare the differential effectiveness of explicit and implicit instruction of two Dutch spelling rules. Students with and without spelling disabilities were instructed a spelling rule either implicitly or explicitly in two experiments. Effects were tested in a pretest-intervention-posttest control group design. Experiment 1…

RuleML-Based Learning Object Interoperability on the Semantic Web

ERIC Educational Resources Information Center

Biletskiy, Yevgen; Boley, Harold; Ranganathan, Girish R.

2008-01-01

Purpose: The present paper aims to describe an approach for building the Semantic Web rules for interoperation between heterogeneous learning objects, namely course outlines from different universities, and one of the rule uses: identifying (in)compatibilities between course descriptions. Design/methodology/approach: As proof of concept, a rule…

29 CFR 102.25 - Ruling on motions.

Code of Federal Regulations, 2012 CFR

2012-07-01

... motions. An administrative law judge designated by the chief administrative law judge, by the associate... his decision. Whenever the administrative law judge has reserved his ruling on any motion, and the... 29 Labor 2 2012-07-01 2012-07-01 false Ruling on motions. 102.25 Section 102.25 Labor Regulations...

29 CFR 102.25 - Ruling on motions.

Code of Federal Regulations, 2014 CFR

2014-07-01

... motions. An administrative law judge designated by the chief administrative law judge, by the associate... his decision. Whenever the administrative law judge has reserved his ruling on any motion, and the... 29 Labor 2 2014-07-01 2014-07-01 false Ruling on motions. 102.25 Section 102.25 Labor Regulations...

29 CFR 102.25 - Ruling on motions.

Code of Federal Regulations, 2010 CFR

2010-07-01

... motions. An administrative law judge designated by the chief administrative law judge, by the associate... his decision. Whenever the administrative law judge has reserved his ruling on any motion, and the... 29 Labor 2 2010-07-01 2010-07-01 false Ruling on motions. 102.25 Section 102.25 Labor Regulations...

29 CFR 102.25 - Ruling on motions.

Code of Federal Regulations, 2013 CFR

2013-07-01

... motions. An administrative law judge designated by the chief administrative law judge, by the associate... his decision. Whenever the administrative law judge has reserved his ruling on any motion, and the... 29 Labor 2 2013-07-01 2013-07-01 false Ruling on motions. 102.25 Section 102.25 Labor Regulations...

7 CFR 29.1132 - Rule 26.

Code of Federal Regulations, 2010 CFR

2010-01-01

... INSPECTION Standards Rules § 29.1132 Rule 26. Tobacco that contains a moderate amount of dirt or sand, but which otherwise meets the specifications of any Primings grade, including the first quality Nondescript from the Primings group, shall be designated by placing the special factor, “dirt” or “sand” after the...

Designing to win in sub-90nm mask production

NASA Astrophysics Data System (ADS)

Zhang, Yuan

2005-11-01

An informal survey conducted with key customers by Photronics indicates that the time gap between technology nodes has accelerated in recent years. Previously the cycle was three years. However, between 130nm and 90nm there was less than a 2 year gap, and between 90nm and 65nm a 1.5 year gap exists. As a result, the technical challenges have increased substantially. In addition, mask costs are rising exponentially due to high capital equipment cost, a shrinking customer base, long write times and increased applications of 193nm EAPSM or AAPSM. Collaboration among EDA companies, mask houses and wafer manufacturers is now more important than ever. This paper will explore avenues for reducing mask costs, mainly in the areas of: write-time reduction through design for manufacturing (DFM), and yield improvement through specification relaxation. Our study conducted through layout vertex modeling suggests that a simple design shape such as a square versus a circle or an angled structure helps reduce shot count and write time. Shot count reduction through mask layout optimization, and advancement in new generation E-beam writers can reduce write time up to 65%. An advanced laser writer can produce those less critical E-beam layers in less than half the time of an e-beam writer. Additionally, the emerging imprint lithography brings new life and new challenges to the photomask industry with applications in many fields outside of the semiconductor industry. As immersion lithography is introduced for 45nm device production, polarization and MEEF effects due to the mask will become severe. Larger magnification not only provides benefits on CD control and MEEF, but also extends the life time of current 90nm/65nm tool sets where 45nm mask sets can be produced at a lower cost.

Gold reflective metallic gratings with high absorption efficiency

NASA Astrophysics Data System (ADS)

Zhang, Zhaojian; Liang, Linmei; Yang, Junbo

2017-10-01

Electromagnetic (EM) wave absorbers are devices in which the incident radiation at the operating wavelengths can be efficiently absorbed and then transformed into ohmic heat or other forms of energy. Especially, EM absorbers based on metallic structures have distinct advantages in comparison with the traditional counterparts. Thus, they have different potential applications at different frequency ranges such as absorbing devices in solar energy harvesting systems. The reflective metallic grating is a kind of metallic EM absorbers and has the fascinating property of efficiently absorbing the incident light due to the excitation of surface plasmon polaritons (SPPs), consequently drawing more and more attention. In this paper, the absorption effect of a reflective metallic grating made of gold is studied by changing grating parameters such as the period, polarization direction of the incident light and so on. We use finite difference time-domain (FDTD) method to design the grating, and simulate the process and detect the absorption spectrum. In our design, the grating has rectangular shaped grooves and has the absorption efficiency 99% for the vertically incident transverse magnetic (TM) light at the wavelength of 818nm with the period of 800 nm, the width of 365 nm and the height of 34 nm. And then we find that the absorption spectrum is blue-shifted about 87 nm with decreasing period from 800 nm to700 nm and red-shifted about 14 nm with increasing the width of the block from 305 nm to 405 nm. The absorption becomes gradually weaker from 98% to almost zero with the polarization angle from 0° to 90°. Finally, we make a theoretical explanation to these phenomena in details. It is believed that the results may provide useful guidance for the design of EM wave absorbers with high absorption efficiency.

Single Mode Fiber Optic Transceiver Using Short Wavelength Active Devices In Long Wavelength Fiber

NASA Astrophysics Data System (ADS)

Gillham, Frederick J.; Campbell, Daniel R.; Corke, Michael; Stowe, David W.

1990-01-01

Presently, single mode optical fiber technology is being utilized in systems to supply telephone service to the subscriber. However, in an attempt to be competitive with copper based systems, there are many development programs underway to determine the most cost effective solution while still providing a service that will either satisfy or be upgradeable to satisfy the demands of the consumer for the next 10 to 20 years. One such approach is to combine low cost laser transmitters and silicon receivers, which have been developed for the "compact disc" industry, with fiber that operates in the single mode regime at 1300 nm. In this paper, an optical transceiver will be presented, consisting of a compact disc laser, a silicon detector and a single mode coupler at 1300 nm. A possible system layout is presented which operates at 780 nm bi-directionally for POTS and upgradeable to 1300 nm for video services. There are several important design criteria that have to be considered in the development of such a system which will be addressed. These include: 1. Optimization of coupled power from laser to fiber while maintaining stable launched conditions over a wide range of environmental conditions. 2. Consideration of the multimode operation of the 1300 nm single mode fiber while operating in the 780 nm wavelength region. 3. Development of a low cost pseudo-wavelength division multiplexer for 1300 nm single mode/780 nm multimode operation and a low cost dual mode 50/50, 780 nm splitter using 1300 nm fiber. Details will be given of the design criteria and solution in terms of optimized design. Results of the performance of several prototype devices will be given with indications of the merits of this approach and where further development effort should be applied.

Extremely small polarization beam splitter based on a multimode interference coupler with a silicon hybrid plasmonic waveguide.

PubMed

Guan, Xiaowei; Wu, Hao; Shi, Yaocheng; Dai, Daoxin

2014-01-15

A novel polarization beam splitter (PBS) with an extremely small footprint is proposed based on a multimode interference (MMI) coupler with a silicon hybrid plasmonic waveguide. The MMI section, covered with a metal strip partially, is designed to achieve mirror imaging for TE polarization. On the other hand, for TM polarization, there is almost no MMI effect since the higher-order TM modes are hardly excited due to the hybrid plasmonic effect. With this design, the whole PBS including the 1.1 μm long MMI section as well as the output section has a footprint as small as ∼1.8 μm×2.5 μm. Besides, the fabrication process is simple since the waveguide dimension is relatively large (e.g., the input/output waveguides widths w ≥300 nm and the MMI width w(MMI)=800 nm). Numerical simulations show that the designed PBS has a broad band of ∼80 nm for an ER >10 dB as well as a large fabrication tolerance to allow a silicon core width variation of -30 nm<Δw<50 nm and a metal strip width variation of -200 nm<Δw(m)<0.

Evaluation of handle design characteristics in a maximum screwdriving torque task.

PubMed

Kong, Y-K; Lowe, B D; Lee, S-J; Krieg, E F

2007-09-01

The purpose of this study was to evaluate the effects of screwdriver handle shape, surface material and workpiece orientation on torque performance, finger force distribution and muscle activity in a maximum screwdriving torque task. Twelve male subjects performed maximum screw-tightening exertions using screwdriver handles with three longitudinal shapes (circular, hexagonal and triangular), four lateral shapes (cylindrical, double frustum, cone and reversed double frustum) and two surfaces (rubber and plastic). The average finger force contributions to the total hand force were 28.1%, 39.3%, 26.5% and 6.2%, in order from index to little fingers; the average phalangeal segment force contributions were 47.3%, 14.0%, 20.5% and 18.1% for distal, middle, proximal and metacarpal phalanges, respectively. The plastic surface handles were associated with 15% less torque output (4.86 Nm) than the rubber coated handles (5.73 Nm). In general, the vertical workpiece orientation was associated with higher torque output (5.9 Nm) than the horizontal orientation (4.69 Nm). Analysis of handle shapes indicates that screwdrivers designed with a circular or hexagonal cross-sectional shape result in greater torque outputs (5.49 Nm, 5.57 Nm), with less total finger force (95 N, 105 N). In terms of lateral shape, reversed double frustum handles were associated with less torque output (5.23 Nm) than the double frustum (5.44 Nm) and cone (5.37 Nm) handles. Screwdriver handles designed with combinations of circular or hexagonal cross-sectional shapes with double frustum and cone lateral shapes were optimal in this study.

MOEMS deformable mirror testing in cryo for future optical instrumentation

NASA Astrophysics Data System (ADS)

Zamkotsian, Frederic; Lanzoni, Patrick; Barette, Rudy; Grassi, Emmanuel; Vors, Patrick; Helmbrecht, Michael; Marchis, Franck; Teichman, Alex

2017-02-01

MOEMS Deformable Mirrors (DM) are key components for next generation optical instruments implementing innovative adaptive optics systems, in existing telescopes as well as in the future ELTs. Due to the wide variety of applications, these DMs must perform at room temperature as well as in cryogenic and vacuum environment. Ideally, the MOEMS-DMs must be designed to operate in such environment. This is unfortunately usually not the case. We will present some major rules for designing / operating DMs in cryo and vacuum. Next step is to characterize with high accuracy the different DM candidates. We chose to use interferometry for the full characterization of these devices, including surface quality measurement in static and dynamical modes, at ambient and in vacuum/cryo. Thanks to our previous set-up developments, we are placing a compact cryo-vacuum chamber designed for reaching 10-6 mbar and 160K, in front of our custom Michelson interferometer, able to measure performances of the DM at actuator/segment level as well as whole mirror level, with a lateral resolution of 2μm and a sub-nanometric zresolution. Using this interferometric bench, we tested the PTT 111 DM from Iris AO: this unique and robust design uses an array of single crystalline silicon hexagonal mirrors with a pitch of 606μm, able to move in tip, tilt and piston with strokes from 5 to 7μm, and tilt angle in the range of +/- 5mrad. They exhibit typically an open-loop flat surface figure as good as < 20nm rms. A specific mount including electronic and opto-mechanical interfaces has been designed for fitting in the test chamber. Segment deformation, mirror shaping, open-loop operation are tested at room and cryo temperature and results are compared. The device could be operated successfully at 160K. An additional, mainly focus-like, 500 nm deformation is measured at 160K; we were able to recover the best flat in cryo by correcting the focus and local tip-tilts on some segments. Tests on DM with different mirror thicknesses (25μm and 50μm) and different coatings (silver and gold) are currently under way. Finally, the goal of these studies is to test DMs in cryo and vacuum conditions as well as to improve their architecture for staying efficient in harsh environment.

A Contribution Toward Understanding the Biospherical Significance of Antarctic Ozone Depletion

NASA Astrophysics Data System (ADS)

Lubin, Dan; Mitchell, B. Greg; Frederick, John E.; Alberts, Amy D.; Booth, C. R.; Lucas, Timothy; Neuschuler, David

1992-05-01

Measurements of biologically active UV radiation made by the National Science Foundation (NSF) scanning spectroradiometer (UV-monitor) at Palmer Station, Antarctica, during the Austral springs of 1988, 1989, and 1990 are presented and compared. Column ozone abundance above Palmer Station is computed from these measurements using a multiple wavelength algorithm. Two contrasting action spectra (biological weighting functions) are used to estimate the biologically relevant dose from the spectral measurements: a standard weighting function for damage to DNA, and a new action spectrum representing the potential for photosynthesis inhibition in Antarctic phytoplankton. The former weights only UV-B wavelengths (280-320 nm) and gives the most weight to wavelengths shorter than 300 nm, while the latter includes large contributions out to 355 nm. The latter is the result of recent Antarctic field work and is relevant in that phytoplankton constitute the base of the Antarctic food web. The modest ozone hole of 1988, in which the ozone abundance above Palmer Station never fell below 200 Dobson units (DU), brought about summerlike doses of DNA-effective UV radiation 2 months early, but UV doses which could inhibit photosynthesis in phytoplankton did not exceed a clear-sky "maximum normal" dose for that time of year. The severe ozone holes of 1989 and 1990, in which the ozone abundance regularly fell below 200 DU, brought about increases in UV surface irradiance weighted by either action spectrum. Ozone abundances and dose-weighted irradiances provided by the NSF UV-monitor are used to derive the radiation amplification factors (RAFs) for both DNA-effective irradiance and phytoplankton-effective irradiance. The RAF for DNA-effective irradiance is nonlinear in ozone abundance and is in excess of the popular "two for one" rule, while the RAF for phytoplankton-effective irradiance approximately follows a "one for one" rule.

The influence of gas pressure on E↔H mode transition in argon inductively coupled plasmas

NASA Astrophysics Data System (ADS)

Zhang, Xiao; Zhang, Zhong-kai; Cao, Jin-xiang; Liu, Yu; Yu, Peng-cheng

2018-03-01

Considering the gas pressure and radio frequency power change, the mode transition of E↔H were investigated in inductively coupled plasmas. It can be found that the transition power has almost the same trend decreasing with gas pressure, whether it is in H mode or E mode. However, the transition density increases slowly with gas pressure from E to H mode. The transition points of E to H mode can be understood by the propagation of electromagnetic wave in the plasma, while the H to E should be illustrated by the electric field strength. Moreover, the electron density, increasing with the pressure and power, can be attributed to the multiple ionization, which changes the energy loss per electron-ion pair created. In addition, the optical emission characteristics in E and H mode is also shown. The line ratio of I750.4 and I811.5, taken as a proxy of the density of metastable state atoms, was used to illustrate the hysteresis. The 750.4 nm line intensity, which has almost the same trend with the 811.5 nm line intensity in H mode, both of them increases with power but decreases with gas pressure. The line ratio of 811.5/750.4 has a different change rule in E mode and H mode, and at the transition point of H to E, it can be one significant factor that results in the hysteresis as the gas pressure change. And compared with the 811.5 nm intensity, it seems like a similar change rule with RF power in E mode. Moreover, some emitted lines with lower rate constants don't turn up in E mode, while can be seen in H mode because the excited state atom density increasing with the electron density.

MAN-004 Design Standards Manual

DOE Office of Scientific and Technical Information (OSTI.GOV)

Peterson, Timothy L.

2014-07-01

At Sandia National Laboratories in New Mexico (SNL/NM), the design, construction, operation, and maintenance of facilities is guided by industry standards, a graded approach, and the systematic analysis of life cycle benefits received for costs incurred. The design of the physical plant must ensure that the facilities are "fit for use," and provide conditions that effectively, efficiently, and safely support current and future mission needs. In addition, SNL/NM applies sustainable design principles, using an integrated whole-building design approach, from site planning to facility design, construction, and operation to ensure building resource efficiency and the health and productivity of occupants. Themore » safety and health of the workforce and the public, any possible effects on the environment, and compliance with building codes take precedence over project issues, such as performance, cost, and schedule. These design standards generally apply to all disciplines on all SNL/NM projects. Architectural and engineering design must be both functional and cost-effective. Facility design must be tailored to fit its intended function, while emphasizing low-maintenance, energy-efficient, and energy-conscious design. Design facilities that can be maintained easily, with readily accessible equipment areas, low maintenance, and quality systems. To promote an orderly and efficient appearance, architectural features of new facilities must complement and enhance the existing architecture at the site. As an Architectural and Engineering (A/E) professional, you must advise the Project Manager when this approach is prohibitively expensive. You are encouraged to use professional judgment and ingenuity to produce a coordinated interdisciplinary design that is cost-effective, easily contractible or buildable, high-performing, aesthetically pleasing, and compliant with applicable building codes. Close coordination and development of civil, landscape, structural, architectural, fire protection, mechanical, electrical, telecommunications, and security features is expected to ensure compatibility with planned functional equipment and to facilitate constructability. If portions of the design are subcontracted to specialists, delivery of the finished design documents must not be considered complete until the subcontracted portions are also submitted for review. You must, along with support consultants, perform functional analyses and programming in developing design solutions. These solutions must reflect coordination of the competing functional, budgetary, and physical requirements for the project. During design phases, meetings between you and the SNL/NM Project Team to discuss and resolve design issues are required. These meetings are a normal part of the design process. For specific design-review requirements, see the project-specific Design Criteria. In addition to the design requirements described in this manual, instructive information is provided to explain the sustainable building practice goals for design, construction, operation, and maintenance of SNL/NM facilities. Please notify SNL/NM personnel of design best practices not included in this manual, so they can be incorporated in future updates.« less

Application of ant colony Algorithm and particle swarm optimization in architectural design

NASA Astrophysics Data System (ADS)

Song, Ziyi; Wu, Yunfa; Song, Jianhua

2018-02-01

By studying the development of ant colony algorithm and particle swarm algorithm, this paper expounds the core idea of the algorithm, explores the combination of algorithm and architectural design, sums up the application rules of intelligent algorithm in architectural design, and combines the characteristics of the two algorithms, obtains the research route and realization way of intelligent algorithm in architecture design. To establish algorithm rules to assist architectural design. Taking intelligent algorithm as the beginning of architectural design research, the authors provide the theory foundation of ant colony Algorithm and particle swarm algorithm in architectural design, popularize the application range of intelligent algorithm in architectural design, and provide a new idea for the architects.

A chip-scale, telecommunications-band frequency conversion interface for quantum emitters.

PubMed

Agha, Imad; Ates, Serkan; Davanço, Marcelo; Srinivasan, Kartik

2013-09-09

We describe a chip-scale, telecommunications-band frequency conversion interface designed for low-noise operation at wavelengths desirable for common single photon emitters. Four-wave-mixing Bragg scattering in silicon nitride waveguides is used to demonstrate frequency upconversion and downconversion between the 980 nm and 1550 nm wavelength regions, with signal-to-background levels > 10 and conversion efficiency of ≈ -60 dB at low continuous wave input pump powers (< 50 mW). Finite element simulations and the split-step Fourier method indicate that increased input powers of ≈ 10 W (produced by amplified nanosecond pulses, for example) will result in a conversion efficiency > 25 % in existing geometries. Finally, we present waveguide designs that can be used to connect shorter wavelength (637 nm to 852 nm) quantum emitters with 1550 nm.

Using economy of means to evolve transition rules within 2D cellular automata.

PubMed

Ripps, David L

2010-01-01

Running a cellular automaton (CA) on a rectangular lattice is a time-honored method for studying artificial life on a digital computer. Commonly, the researcher wishes to investigate some specific or general mode of behavior, say, the ability of a coherent pattern of points to glide within the lattice, or to generate copies of itself. This technique has a problem: how to design the transitions table-the set of distinct rules that specify the next content of a cell from its current content and that of its near neighbors. Often the table is painstakingly designed manually, rule by rule. The problem is exacerbated by the potentially vast number of individual rules that need be specified to cover all combinations of center and neighbors when there are several symbols in the alphabet of the CA. In this article a method is presented to have the set of rules evolve automatically while running the CA. The transition table is initially empty, with rules being added as the need arises. A novel principle drives the evolution: maximum economy of means-maximizing the reuse of rules introduced on previous cycles. This method may not be a panacea applicable to all CA studies. Nevertheless, it is sufficiently potent to evolve sets of rules and associated patterns of points that glide (periodically regenerate themselves at another location) and to generate gliding "children" that then "mate" by collision.

78 FR 79721 - Self-Regulatory Organizations; NYSE Arca, Inc.; Notice of Designation of a Longer Period for...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-12-31

... Proposed Rule Change, as Modified by Amendment No. 1 Thereto, To Adopt Commentary .03 to Rule 6.91 To Limit the Volume of Complex Orders by a Single OTP Holder or OTP Firm During the Trading Day December 24... Act of 1934 (``Act'') \\1\\ and Rule 19b-4 thereunder,\\2\\ a proposed rule change to adopt Commentary .03...

Design of an Airborne Portable Remote Imaging Spectrometer (PRISM) for the Coastal Ocean

NASA Technical Reports Server (NTRS)

Mouroulis, P.; vanGorp, B.; Green, R. O.; Cohen, D.; Wilson, D.; Randall, D.; Rodriguez, J.; Polanco, O.; Dierssen, H.; Balasubramanian, K.;

77 FR 5751 - Marine Recreational Fisheries of the United States; National Saltwater Angler Registry and State...

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2012-02-06

... in carrying out surveys, it may be appropriate to utilize survey designs in USVI that are different... State under the qualifying regional survey option of the rule; and clarify and update various provisions... be designated as an Exempted State under the qualifying regional survey option of the rule; and (4...

77 FR 67844 - Self-Regulatory Organizations; Chicago Board Options Exchange, Incorporated; Order Granting...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-11-14

... Regulatory Circular the required layout for the data that would be submitted to the Exchange.\\7\\ \\5\\ See... Section 6(b)(5) of the Act,\\10\\ which requires, among other things, that the Exchange's rules be designed... that CBOE's proposed rule change is designed to facilitate the production of uniform data by TPHs...

78 FR 57480 - Safety Zone; 2013 Annual Islamorada Swim for Alligator Lighthouse, Atlantic Ocean; Islamorada, FL

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2013-09-19

... Captain of the Port Key West or a designated representative. DATES: This rule will be enforced from 8 a.m... rule, call or email Marine Science Technician First Class Ian G. Bowes, Sector Key West Prevention... the Port Key West or a designated representative, all persons and vessels receiving such authorization...

77 FR 46781 - Self-Regulatory Organizations; Chicago Board Options Exchange, Incorporated; Order Approving a...

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2012-08-06

... rules. See id. A. SAL SAL is a feature within CBOE's Hybrid System designed to provide price improvement... before being booked in the electronic complex order book (``COB'') or on a PAR workstation.\\22\\ To the... rules of a national securities exchange be designed to prevent fraudulent and manipulative acts and...

77 FR 31050 - Self-Regulatory Organizations; The NASDAQ Stock Market LLC; Notice of Designation of a Longer...

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2012-05-24

... from NASDAQ Rule 2460 (Payment for Market Making). Accordingly, the Commission, pursuant to Section 19...-Regulatory Organizations; The NASDAQ Stock Market LLC; Notice of Designation of a Longer Period for Commission Action on Proposed Rule Change, as Modified by Amendment No. 1 Thereto, To Establish the Market...

77 FR 50187 - Self-Regulatory Organizations; NASDAQ OMX PHLX LLC; Order Approving a Proposed Rule Change With...

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2012-08-20

... nondiscriminatory fashion.\\14\\ \\14\\ See Phlx Rule 3315(d)(3). Phlx and NES will be required to assign all error... will be required to establish and enforce policies and procedures that are reasonably designed to... exchange be designed to prevent fraudulent and manipulative acts and practices, to promote just and...

78 FR 48532 - Self-Regulatory Organizations; Chicago Board Options Exchange, Incorporated; Notice of Filing and...

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2013-08-08

... ``Act'').\\3\\ The Plan is primarily designed to, among other things, address extraordinary market... No. 67091 (May 31, 2012) 77 FR 33498 (June 6, 2012). Though the Plan was primarily designed for... filing are, ``No-Bid Series'' which are actually found in Exchange Rule 6.13(b)(vi) and not Exchange Rule...

77 FR 39314 - Self-Regulatory Organizations; The NASDAQ Stock Market LLC; Notice of Designation of a Longer...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-07-02

...-Regulatory Organizations; The NASDAQ Stock Market LLC; Notice of Designation of a Longer Period for Commission Action on Proposed Rule Change To Establish ``Benchmark Orders'' Under NASDAQ Rule 4751(f) June 26, 2012. On May 1, 2012, The NASDAQ Stock Market LLC (``NASDAQ'' or ``Exchange'') filed with the...

78 FR 11238 - Self-Regulatory Organizations; NYSE Arca, Inc.; Order Granting Approval of Proposed Rule Change...

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2013-02-15

... composition and/or changes to the portfolio and will be subject to procedures designed to prevent the use and... evaluate the security's comparative credit rating. To the extent that the Fund invests in unrated... Exchange's rules be designed to prevent fraudulent and manipulative acts and practices, to promote just and...

78 FR 53390 - Endangered and Threatened Wildlife and Plants; Designation of Critical Habitat for the Jaguar

Federal Register 2010, 2011, 2012, 2013, 2014

2013-08-29

... Habitat for the Jaguar AGENCY: Fish and Wildlife Service, Interior. ACTION: Proposed rule; reopening of... the jaguar (Panthera onca), as revised on July 1, 2013, under the Endangered Species Act of 1973, as...: Background On August 20, 2012, we published a proposed rule to designate critical habitat for the jaguar (77...

77 FR 47472 - Self-Regulatory Organizations; The NASDAQ Stock Market LLC; Order Approving Proposed Rule Change...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-08-08

.... During pre and post-market hours, the wider Designated Percentage and Defined Limit associated with the 9... Exchange, the automated quote management functionality (``AQ'') offered by these rules is designed to help Exchange market makers meet the enhanced market maker obligations adopted post May 6, 2010,\\6\\ and avoid...

Infrared reflective coatings for building and automobile glass windows for heat protection

NASA Astrophysics Data System (ADS)

Butt, M. A.; Fomchenkov, S. A.; Kazanskiy, N. L.; Ullah, A.; Ali, R. Z.; Habib, M.

2017-04-01

Sunlight can be used a source of light in buildings and automobiles, however infrared wavelengths in sunlight result in heating. In this work, Infrared Reflective Coatings are designed using thin films to transmit visible wavelengths 400 700 nm while reflecting infrared wavelengths above 700 nm. Three different design approaches have been used, namely single layer of metal, sandwich structure and multilayer design. Four metals (Ag, Au, Al and Cu) and two dielectrics (TiO2 and SiO2) are used in this study. Designs with Ag show maximum reflection of Infrared wavelengths in all designs. Sandwich structures of TiO2-Ag-TiO2 on substrate with 22 nm of thickness for each layer show the maximum transmission of 87% in the visible region and maximum reflection of Infrared wavelengths.

Effect of commercial and military performance requirements for transport category aircraft on space shuttle booster design and operation

NASA Technical Reports Server (NTRS)

Bithell, R. A.; Pence, W. A., Jr.

1972-01-01

The effect of two sets of performance requirements, commercial and military, on the design and operation of the space shuttle booster is evaluated. Critical thrust levels are established according to both sets of operating rules for the takeoff, cruise, and go-around flight modes, and the effect on engine requirements determined. Both flyback and ferry operations are considered. The impact of landing rules on potential shuttle flyback and ferry bases is evaluated. Factors affecting reserves are discussed, including winds, temperature, and nonstandard flight operations. Finally, a recommended set of operating rules is proposed for both flyback and ferry operations that allows adequate performance capability and safety margins without compromising design requirements for either flight phase.

The design of broad band anti-reflection coatings for solar cell applications

NASA Astrophysics Data System (ADS)

Siva Rama Krishna, Angirekula; Sabat, Samrat Lagnajeet; Ghanashyam Krishna, Mamidipudi

2017-01-01

The design of broadband anti-reflection coatings (ARCs) for solar cell applications using multiobjective differential evolutionary (MODE) algorithms is reported. The effect of thickness and refractive index contrast within the layers of the ARC on the bandwidth of reflectance is investigated in detail. In the case of the hybrid plasmonic ARC structures the effect of size, shape and filling fraction of silver (Ag) nanoparticles on the reflectance is studied. Bandwidth is defined as the spectral region of wavelengths over which the reflectance is below 2%. Single, two and three layers ARCs (consisting of MgF2, Al2O3, Si3N4, TiO2 and ZnS or combinations of these materials) were simulated for performance evaluation on an a-Si photovoltaic cell. It is observed that the three layer ARC consisting of MgF2/Si3N4/TiO2(ZnTe) of 81/42/36 nm thicknesses, respectively, exhibited a weighted reflectance of 1.9% with a bandwidth of 450 nm over the wavelength range of 300-900 nm. The ARC bandwidth could be further improved by embedding randomly distributed Ag nanoparticles of size between 100 and 120 nm on a two layer ARC consisting of Al2O3/TiO2 with thickness of 42 nm and 56 nm respectively. This plasmon-dielectric hybrid ARC design exhibited a weighted reflectance of 0.6% with a bandwidth of 560 nm over the wavelength range of 300-900 nm.

Evolving fuzzy rules for relaxed-criteria negotiation.

PubMed

Sim, Kwang Mong

2008-12-01

In the literature on automated negotiation, very few negotiation agents are designed with the flexibility to slightly relax their negotiation criteria to reach a consensus more rapidly and with more certainty. Furthermore, these relaxed-criteria negotiation agents were not equipped with the ability to enhance their performance by learning and evolving their relaxed-criteria negotiation rules. The impetus of this work is designing market-driven negotiation agents (MDAs) that not only have the flexibility of relaxing bargaining criteria using fuzzy rules, but can also evolve their structures by learning new relaxed-criteria fuzzy rules to improve their negotiation outcomes as they participate in negotiations in more e-markets. To this end, an evolutionary algorithm for adapting and evolving relaxed-criteria fuzzy rules was developed. Implementing the idea in a testbed, two kinds of experiments for evaluating and comparing EvEMDAs (MDAs with relaxed-criteria rules that are evolved using the evolutionary algorithm) and EMDAs (MDAs with relaxed-criteria rules that are manually constructed) were carried out through stochastic simulations. Empirical results show that: 1) EvEMDAs generally outperformed EMDAs in different types of e-markets and 2) the negotiation outcomes of EvEMDAs generally improved as they negotiated in more e-markets.

The Path to Advanced Practice Licensure for Clinical Nurse Specialists in Washington State.

PubMed

Schoonover, Heather

The aim of this study was to provide a review of the history and process to obtaining advanced practice licensure for clinical nurse specialists in Washington State. Before 2016, Washington State licensed certified nurse practitioners, certified nurse midwives, and certified nurse anesthetists under the designation of an advanced registered nurse practitioner; however, the state did not recognize clinical nurse specialists as advanced practice nurses. The work to drive the rule change began in 2007. The Washington Affiliate of the National Association of Clinical Nurse Specialists used the Power Elite Theory to guide advocacy activities, building coalitions and support for the desired rule changes. On January 8, 2016, the Washington State Nursing Care Quality Assurance Commission voted to amend the state's advanced practice rules, including clinical nurse specialists in the designation of an advanced practice nurse. Since the rule revision, clinical nurse specialists in Washington State have been granted advanced registered nurse practitioner licenses. Driving changes in state regulatory rules requires diligent advocacy, partnership, and a deep understanding of the state's rule-making processes. To be successful in changing rules, clinical nurse specialists must build strong partnerships with key influencers and understand the steps in practice required to make the desired changes.

Optics Toolbox: An Intelligent Relational Database System For Optical Designers

NASA Astrophysics Data System (ADS)

Weller, Scott W.; Hopkins, Robert E.

1986-12-01

Optical designers were among the first to use the computer as an engineering tool. Powerful programs have been written to do ray-trace analysis, third-order layout, and optimization. However, newer computing techniques such as database management and expert systems have not been adopted by the optical design community. For the purpose of this discussion we will define a relational database system as a database which allows the user to specify his requirements using logical relations. For example, to search for all lenses in a lens database with a F/number less than two, and a half field of view near 28 degrees, you might enter the following: FNO < 2.0 and FOV of 28 degrees ± 5% Again for the purpose of this discussion, we will define an expert system as a program which contains expert knowledge, can ask intelligent questions, and can form conclusions based on the answers given and the knowledge which it contains. Most expert systems store this knowledge in the form of rules-of-thumb, which are written in an English-like language, and which are easily modified by the user. An example rule is: IF require microscope objective in air and require NA > 0.9 THEN suggest the use of an oil immersion objective The heart of the expert system is the rule interpreter, sometimes called an inference engine, which reads the rules and forms conclusions based on them. The use of a relational database system containing lens prototypes seems to be a viable prospect. However, it is not clear that expert systems have a place in optical design. In domains such as medical diagnosis and petrology, expert systems are flourishing. These domains are quite different from optical design, however, because optical design is a creative process, and the rules are difficult to write down. We do think that an expert system is feasible in the area of first order layout, which is sufficiently diagnostic in nature to permit useful rules to be written. This first-order expert would emulate an expert designer as he interacted with a customer for the first time: asking the right questions, forming conclusions, and making suggestions. With these objectives in mind, we have developed the Optics Toolbox. Optics Toolbox is actually two programs in one: it is a powerful relational database system with twenty-one search parameters, four search modes, and multi-database support, as well as a first-order optical design expert system with a rule interpreter which has full access to the relational database. The system schematic is shown in Figure 1.

77 FR 9532 - Air Quality Designations for the 2010 Primary Nitrogen Dioxide (NO2

Federal Register 2010, 2011, 2012, 2013, 2014

2012-02-17

...This rule establishes air quality designations for all areas in the United States for the 2010 Primary Nitrogen Dioxide (NO2) National Ambient Air Quality Standards (NAAQS). Based on air quality monitoring data, the EPA is issuing this rule to designate all areas of the country as ``unclassifiable/attainment'' for the 2010 NO2 NAAQS. The EPA is designating areas as ``unclassifiable/attainment'' to mean that available information does not indicate that the air quality in these areas exceeds the 2010 NO2 NAAQS.

A CLIPS-based tool for aircraft pilot-vehicle interface design

NASA Technical Reports Server (NTRS)

Fowler, Thomas D.; Rogers, Steven P.

1991-01-01

The Pilot-Vehicle Interface of modern aircraft is the cognitive, sensory, and psychomotor link between the pilot, the avionics modules, and all other systems on board the aircraft. To assist pilot-vehicle interface designers, a C Language Integrated Production System (CLIPS) based tool was developed that allows design information to be stored in a table that can be modified by rules representing design knowledge. Developed for the Apple Macintosh, the tool allows users without any CLIPS programming experience to form simple rules using a point and click interface.

Computer-aided design of nano-filter construction using DNA self-assembly

NASA Astrophysics Data System (ADS)

Mohammadzadegan, Reza; Mohabatkar, Hassan

2007-01-01

Computer-aided design plays a fundamental role in both top-down and bottom-up nano-system fabrication. This paper presents a bottom-up nano-filter patterning process based on DNA self-assembly. In this study we designed a new method to construct fully designed nano-filters with the pores between 5 nm and 9 nm in diameter. Our calculations illustrated that by constructing such a nano-filter we would be able to separate many molecules.

Reinforcement interval type-2 fuzzy controller design by online rule generation and q-value-aided ant colony optimization.

PubMed

Juang, Chia-Feng; Hsu, Chia-Hung

2009-12-01

This paper proposes a new reinforcement-learning method using online rule generation and Q-value-aided ant colony optimization (ORGQACO) for fuzzy controller design. The fuzzy controller is based on an interval type-2 fuzzy system (IT2FS). The antecedent part in the designed IT2FS uses interval type-2 fuzzy sets to improve controller robustness to noise. There are initially no fuzzy rules in the IT2FS. The ORGQACO concurrently designs both the structure and parameters of an IT2FS. We propose an online interval type-2 rule generation method for the evolution of system structure and flexible partitioning of the input space. Consequent part parameters in an IT2FS are designed using Q -values and the reinforcement local-global ant colony optimization algorithm. This algorithm selects the consequent part from a set of candidate actions according to ant pheromone trails and Q-values, both of which are updated using reinforcement signals. The ORGQACO design method is applied to the following three control problems: 1) truck-backing control; 2) magnetic-levitation control; and 3) chaotic-system control. The ORGQACO is compared with other reinforcement-learning methods to verify its efficiency and effectiveness. Comparisons with type-1 fuzzy systems verify the noise robustness property of using an IT2FS.

A hybrid intelligence approach to artifact recognition in digital publishing

NASA Astrophysics Data System (ADS)

Vega-Riveros, J. Fernando; Santos Villalobos, Hector J.

2006-02-01

The system presented integrates rule-based and case-based reasoning for artifact recognition in Digital Publishing. In Variable Data Printing (VDP) human proofing could result prohibitive since a job could contain millions of different instances that may contain two types of artifacts: 1) evident defects, like a text overflow or overlapping 2) style-dependent artifacts, subtle defects that show as inconsistencies with regard to the original job design. We designed a Knowledge-Based Artifact Recognition tool for document segmentation, layout understanding, artifact detection, and document design quality assessment. Document evaluation is constrained by reference to one instance of the VDP job proofed by a human expert against the remaining instances. Fundamental rules of document design are used in the rule-based component for document segmentation and layout understanding. Ambiguities in the design principles not covered by the rule-based system are analyzed by case-based reasoning, using the Nearest Neighbor Algorithm, where features from previous jobs are used to detect artifacts and inconsistencies within the document layout. We used a subset of XSL-FO and assembled a set of 44 document samples. The system detected all the job layout changes, while obtaining an overall average accuracy of 84.56%, with the highest accuracy of 92.82%, for overlapping and the lowest, 66.7%, for the lack-of-white-space.

Liquid rocket pressure regulators, relief valves, check valves, burst disks, and explosive valves. [design techniques and practices

NASA Technical Reports Server (NTRS)

1973-01-01

The development of and operational programs for effective use in design are presented for liquid rocket pressure regulators, relief valves, check valves, burst disks, and explosive valves. A review of the total design problem is presented, and design elements are identified which are involved in successful design. Current technology pertaining to these elements is also described. Design criteria are presented which state what rule or standard must be imposed on each essential design element to assure successful design. These criteria serve as a checklist of rules for a project manager to use in guiding a design or in assessing its adequacy. Recommended practices are included which state how to satisfy each of the criteria.

High efficient light absorption and nanostructure-dependent birefringence of a metal-dielectric symmetrical layered structure

NASA Astrophysics Data System (ADS)

Jen, Yi-Jun; Jhang, Yi-Ciang; Liu, Wei-Chih

2017-08-01

A multilayer that comprises ultra-thin metal and dielectric films has been investigated and applied as a layered metamaterial. By arranging metal and dielectric films alternatively and symmetrically, the equivalent admittance and refractive index can be tailored separately. The tailored admittance and refractive index enable us to design optical filters with more flexibility. The admittance matching is achieved via the admittance tracing in the normalized admittance diagram. In this work, an ultra-thin light absorber is designed as a multilayer composed of one or several cells. Each cell is a seven-layered film stack here. The design concept is to have the extinction as large as possible under the condition of admittance matching. For a seven-layered symmetrical film stack arranged as Ta2O5 (45 nm)/ a-Si (17 nm)/ Cr (30 nm)/ Al (30 nm)/ Cr (30 nm)/ a-Si (17 nm)/ Ta2O5 (45 nm), its mean equivalent admittance and extinction coefficient over the visible regime is 1.4+0.2i and 2.15, respectively. The unit cell on a transparent BK7 glass substrate absorbs 99% of normally incident light energy for the incident medium is glass. On the other hand, a transmission-induced metal-dielectric film stack is investigated by using the admittance matching method. The equivalent anisotropic property of the metal-dielectric multilayer varied with wavelength and nanostructure are investigated here.

Ultrashort broadband polarization beam splitter based on a combined hybrid plasmonic waveguide

PubMed Central

Chang, Ken-Wei; Huang, Chia-Chien

2016-01-01

We propose an ultracompact broadband polarization beam splitter (PBS) based on a combined hybrid plasmonic waveguide (HPW). The proposed PBS separates transverse-electric (TE) and transverse-magnetic (TM) modes using a bent lower HPW with vertical nanoscale gaps and a straight upper HPW with a horizontal nanoscale gap, respectively, without relying on an additional coupling region. This design considerably reduces the length of the PBS to the submicron scale (920 nm, the shortest PBS reported to date) while offering polarization extinction ratios (PERs) of ~19 dB (~18 dB) and insertion losses (ILs) of ~0.6 dB (~0.3 dB) for the TE (TM) mode over an extremely broad band of 400 nm (from λ = 1300 nm to 1700 nm, covering entirely second and third telecom windows). The length of the designed PBS can be reduced further to 620 nm while still offering PERs of 15 dB, realizing a densely photonic integrated circuit. Considering the fabrication tolerance, the designed PBS allows for large geometrical deviations of ±20 nm while restricting PER variations to within 1 dB, except for those in the nanoscale gaps smaller than 10nm. Additionally, we also address the input and ouput coupling efficiencies of the proposed PBS. PMID:26786972

78 FR 31412 - Drawbridge Operation Regulation; Thea Foss Waterway Previously Known as City Waterway, Tacoma, WA

Federal Register 2010, 2011, 2012, 2013, 2014

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... openings during designated hours. This rule also removes previously authorized closure periods for the... for requesting emergency bridge openings. DATES: This rule is effective June 24, 2013. ADDRESSES... needed to request emergency openings of the bridge. C. Discussion of Comments, Changes and the Final Rule...

42 CFR 422.314 - Special rules for beneficiaries enrolled in MA MSA plans.

Code of Federal Regulations, 2011 CFR

2011-10-01

... 42 Public Health 3 2011-10-01 2011-10-01 false Special rules for beneficiaries enrolled in MA MSA... Advantage Organizations § 422.314 Special rules for beneficiaries enrolled in MA MSA plans. (a) Establishment and designation of medical savings account (MSA). A beneficiary who elects coverage under an MA...

42 CFR 422.314 - Special rules for beneficiaries enrolled in MA MSA plans.

Code of Federal Regulations, 2010 CFR

2010-10-01

... 42 Public Health 3 2010-10-01 2010-10-01 false Special rules for beneficiaries enrolled in MA MSA... Advantage Organizations § 422.314 Special rules for beneficiaries enrolled in MA MSA plans. (a) Establishment and designation of medical savings account (MSA). A beneficiary who elects coverage under an MA...

75 FR 59090 - Approval and Promulgation of Implementation Plans and Designation of Areas for Air Quality...

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.... These revisions include the suspension of a local wintertime cleaner burning gasoline rule, and the relaxation of a State rule governing wintertime gasoline in Clark County. EPA's proposed approval of the... limit in the State wintertime gasoline rule, if necessary, to implement the related contingency measure...

76 FR 62126 - Self-Regulatory Organizations; Chicago Stock Exchange, Inc.; Notice of Filing and Immediate...

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2011-10-06

... Change To Eliminate Certain References to the Exchange Acting as the Designated Examining Authority... Rule Change CHX proposes to amend its rules to eliminate certain references to the Exchange acting as... references and the Exchange plans on eliminating those in a subsequent proposal to conform our rules with...

77 FR 47479 - Self-Regulatory Organizations; Chicago Stock Exchange, Inc.; Notice of Filing and Immediate...

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2012-08-08

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78 FR 46563 - Endangered and Threatened Species: Proposed Rule To Designate Critical Habitat for the Northwest...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-08-01

... DEPARTMENT OF COMMERCE National Oceanic and Atmospheric Administration 50 CFR Part 226 [Docket No...), Commerce. ACTION: Proposed rule; request for comments; correction. SUMMARY: In the proposed rule that we... electronic public comments via the Federal e-Rulemaking Portal. Go to www.regulations.gov/#!docketDetail ;D...

"Chaos Rules" Revisited

ERIC Educational Resources Information Center

Murphy, David

2011-01-01

About 20 years ago, while lost in the midst of his PhD research, the author mused over proposed titles for his thesis. He was pretty pleased with himself when he came up with "Chaos Rules" (the implied double meaning was deliberate), or more completely, "Chaos Rules: An Exploration of the Work of Instructional Designers in Distance Education." He…

Athletes Question Effectiveness of NCAA Rule

ERIC Educational Resources Information Center

Wolverton, Brad

2007-01-01

Three years ago, as part of a broad effort to raise academic standards in college sports, the NCAA adopted a controversial rule designed to make life difficult for athletes idling in the classroom. The measure--known as the 40-60-80 rule, or the "progress toward degree" requirement--mandates that, to remain eligible to compete, athletes must…

78 FR 43122 - Endangered and Threatened Wildlife and Plants; Endangered Status for the Sierra Nevada Yellow...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-07-19

... in preparation of a final determination on our proposed listings and designation of critical habitat... fully consider them in preparation of the final rules. DATES: The comment periods for the proposed rules... preparation of the final rules. We intend that any final actions [[Page 43123

76 FR 81549 - Self-Regulatory Organizations; Financial Industry Regulatory Authority, Inc.; Notice of Filing...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-12-28

... securities. \\5\\ The exemption in FINRA Rule 6730(e)(4) is conditioned, among other things, upon a data... the Act,\\6\\ which requires, among other things, that FINRA rules must be designed to prevent... following methods: Electronic Comments Use the Commission's Internet comment form ( http://www.sec.gov/rules...

75 FR 55267 - Airspace Designations; Incorporation By Reference

Federal Register 2010, 2011, 2012, 2013, 2014

2010-09-10

... airspace listings in FAA Order 7400.9T in full text as proposed rule documents in the Federal Register. Likewise, all amendments of these listings were published in full text as final rules in the Federal... Order 7400.9U in full text as proposed rule documents in the Federal Register. Likewise, all amendments...

Designing boosting ensemble of relational fuzzy systems.

PubMed

Scherer, Rafał

2010-10-01

A method frequently used in classification systems for improving classification accuracy is to combine outputs of several classifiers. Among various types of classifiers, fuzzy ones are tempting because of using intelligible fuzzy if-then rules. In the paper we build an AdaBoost ensemble of relational neuro-fuzzy classifiers. Relational fuzzy systems bond input and output fuzzy linguistic values by a binary relation; thus, fuzzy rules have additional, comparing to traditional fuzzy systems, weights - elements of a fuzzy relation matrix. Thanks to this the system is better adjustable to data during learning. In the paper an ensemble of relational fuzzy systems is proposed. The problem is that such an ensemble contains separate rule bases which cannot be directly merged. As systems are separate, we cannot treat fuzzy rules coming from different systems as rules from the same (single) system. In the paper, the problem is addressed by a novel design of fuzzy systems constituting the ensemble, resulting in normalization of individual rule bases during learning. The method described in the paper is tested on several known benchmarks and compared with other machine learning solutions from the literature.

Theoretical and subjective bit assignments in transform picture

NASA Technical Reports Server (NTRS)

Jones, H. W., Jr.

1977-01-01

It is shown that all combinations of symmetrical input distributions with difference distortion measures give a bit assignment rule identical to the well-known rule for a Gaussian input distribution with mean-square error. Published work is examined to show that the bit assignment rule is useful for transforms of full pictures, but subjective bit assignments for transform picture coding using small block sizes are significantly different from the theoretical bit assignment rule. An intuitive explanation is based on subjective design experience, and a subjectively obtained bit assignment rule is given.

On ethics and the earthquake resistant interior design of buildings.

PubMed

Hurol, Yonca

2014-03-01

The most common tectonic quality of modern structures, such as frame systems, is their flexibility; they are open for change. Although this characteristic is a big advantage in comparison to the inflexible masonry structures of the past, it might also create some serious problems, such as e.g. the lack of safety in the event of an earthquake, if the flexibility is not used consciously by architects and interior designers. This article attempts to define and establish some rules for the interior design of buildings with reinforced concrete frame systems. The rules for making subtractions from these structures and extending them by making additions to them are contained within this article. The main objective of this article is to derive some ethical values from these rules. Thus, the conclusion of the article focuses on the derivation of some ethical values for achieving earthquake resistant interior design of buildings with reinforced concrete frame systems.

Improved specificity of TALE-based genome editing using an expanded RVD repertoire.

PubMed

Miller, Jeffrey C; Zhang, Lei; Xia, Danny F; Campo, John J; Ankoudinova, Irina V; Guschin, Dmitry Y; Babiarz, Joshua E; Meng, Xiangdong; Hinkley, Sarah J; Lam, Stephen C; Paschon, David E; Vincent, Anna I; Dulay, Gladys P; Barlow, Kyle A; Shivak, David A; Leung, Elo; Kim, Jinwon D; Amora, Rainier; Urnov, Fyodor D; Gregory, Philip D; Rebar, Edward J

2015-05-01

Transcription activator-like effector (TALE) proteins have gained broad appeal as a platform for targeted DNA recognition, largely owing to their simple rules for design. These rules relate the base specified by a single TALE repeat to the identity of two key residues (the repeat variable diresidue, or RVD) and enable design for new sequence targets via modular shuffling of these units. A key limitation of these rules is that their simplicity precludes options for improving designs that are insufficiently active or specific. Here we address this limitation by developing an expanded set of RVDs and applying them to improve the performance of previously described TALEs. As an extreme example, total conversion of a TALE nuclease to new RVDs substantially reduced off-target cleavage in cellular studies. By providing new RVDs and design strategies, these studies establish options for developing improved TALEs for broader application across medicine and biotechnology.

Design Rules for Tailoring Antireflection Properties of Hierarchical Optical Structures

DOE PAGES

Leon, Juan J. Diaz; Hiszpanski, Anna M.; Bond, Tiziana C.; ...

2017-05-18

Hierarchical structures consisting of small sub-wavelength features stacked atop larger structures have been demonstrated as an effective means of reducing the reflectance of surfaces. However, optical devices require different antireflective properties depending on the application, and general unifying guidelines on hierarchical structures' design to attain a desired antireflection spectral response are still lacking. The type of reflectivity (diffuse, specular, or total/hemispherical) and its angular- and spectral-dependence are all dictated by the structural parameters. Through computational and experimental studies, guidelines have been devised to modify these various aspects of reflectivity across the solar spectrum by proper selection of the features ofmore » hierarchical structures. In this wavelength regime, micrometer-scale substructures dictate the long-wavelength spectral response and effectively reduce specular reflectance, whereas nanometer-scale substructures dictate primarily the visible wavelength spectral response and reduce diffuse reflectance. Coupling structures having these two length scales into hierarchical arrays impressively reduces surfaces' hemispherical reflectance across a broad spectrum of wavelengths and angles. Furthermore, such hierarchical structures in silicon are demonstrated having an average total reflectance across the solar spectrum of 1.1% (average weighted reflectance of 1% in the 280–2500 nm range of the AM 1.5 G spectrum) and specular reflectance <1% even at angles of incidence as high as 67°.« less

Optimization of cellulose nanocrystal length and surface charge density through phosphoric acid hydrolysis

NASA Astrophysics Data System (ADS)

Vanderfleet, Oriana M.; Osorio, Daniel A.; Cranston, Emily D.

2017-12-01

Cellulose nanocrystals (CNCs) are emerging nanomaterials with a large range of potential applications. CNCs are typically produced through acid hydrolysis with sulfuric acid; however, phosphoric acid has the advantage of generating CNCs with higher thermal stability. This paper presents a design of experiments approach to optimize the hydrolysis of CNCs from cotton with phosphoric acid. Hydrolysis time, temperature and acid concentration were varied across nine experiments and a linear least-squares regression analysis was applied to understand the effects of these parameters on CNC properties. In all but one case, rod-shaped nanoparticles with a high degree of crystallinity and thermal stability were produced. A statistical model was generated to predict CNC length, and trends in phosphate content and zeta potential were elucidated. The CNC length could be tuned over a relatively large range (238-475 nm) and the polydispersity could be narrowed most effectively by increasing the hydrolysis temperature and acid concentration. The CNC phosphate content was most affected by hydrolysis temperature and time; however, the charge density and colloidal stability were considered low compared with sulfuric acid hydrolysed CNCs. This study provides insight into weak acid hydrolysis and proposes `design rules' for CNCs with improved size uniformity and charge density. This article is part of a discussion meeting issue `New horizons for cellulose nanotechnology'.

Flexible Computing Architecture for Real Time Skin Detection

DTIC Science & Technology

2010-03-01

Figure 6. Spectra of Light and Dark Skin Compared with Spectra of Other Materials .............. 2-5 Figure 7(a.) Joint Distribution of (NDSI/ NDVI ...Vegetation Index ( NDVI ). In Eqn. 2, and are the estimated reflectances of the 660 and 750 nm wavelengths, respectively. As can be seen from Eqn...values, while the rules based detectors use a rectangular bound on either (NDSI, NDVI ) or (NDSI, NDGRI) pairs. The last detection algorithm is the

Development of Combined Asymptotic and Numerical Procedures for Transonic and Hypersonic Flows.

DTIC Science & Technology

1996-04-01

11991 thru December 311995 Contract No. F49620-92-C-0006 Prepared for: Air Force Office of Scientific Research, AFOSR/NM Directorate of Mathematical and...MOMOMNO Air Force Office of Scientific Research AGENCY REOT NUMBER AFOSRJNM Directorat of Mathematical and information Sciences Bldg 410 Boiling AFS, DC...128 wind tunnel leading to the generalization of our Transonic Area Rule for Wind Tunnel Wall Interference (TARWI) to test articles of length

Testing the Developmental Origins of Health and Disease Hypothesis for Psychopathology Using Family-Based Quasi-Experimental Designs

PubMed Central

D’Onofrio, Brian M.; Class, Quetzal A.; Lahey, Benjamin B.; Larsson, Henrik

2014-01-01

The Developmental Origin of Health and Disease (DOHaD) hypothesis is a broad theoretical framework that emphasizes how early risk factors have a causal influence on psychopathology. Researchers have raised concerns about the causal interpretation of statistical associations between early risk factors and later psychopathology because most existing studies have been unable to rule out the possibility of environmental and genetic confounding. In this paper we illustrate how family-based quasi-experimental designs can test the DOHaD hypothesis by ruling out alternative hypotheses. We review the logic underlying sibling-comparison, co-twin control, offspring of siblings/twins, adoption, and in vitro fertilization designs. We then present results from studies using these designs focused on broad indices of fetal development (low birth weight and gestational age) and a particular teratogen, smoking during pregnancy. The results provide mixed support for the DOHaD hypothesis for psychopathology, illustrating the critical need to use design features that rule out unmeasured confounding. PMID:25364377

Wet cooling towers: rule-of-thumb design and simulation

DOE Office of Scientific and Technical Information (OSTI.GOV)

Leeper, Stephen A.

1981-07-01

A survey of wet cooling tower literature was performed to develop a simplified method of cooling tower design and simulation for use in power plant cycle optimization. The theory of heat exchange in wet cooling towers is briefly summarized. The Merkel equation (the fundamental equation of heat transfer in wet cooling towers) is presented and discussed. The cooling tower fill constant (Ka) is defined and values derived. A rule-of-thumb method for the optimized design of cooling towers is presented. The rule-of-thumb design method provides information useful in power plant cycle optimization, including tower dimensions, water consumption rate, exit air temperature,more » power requirements and construction cost. In addition, a method for simulation of cooling tower performance at various operating conditions is presented. This information is also useful in power plant cycle evaluation. Using the information presented, it will be possible to incorporate wet cooling tower design and simulation into a procedure to evaluate and optimize power plant cycles.« less

Comparative laser Doppler measurement on tooth pulp blood flow at 632 and 750 nm

NASA Astrophysics Data System (ADS)

Oberg, P. Ake; Pettersson, Hans; Rohman, Hakan

1993-12-01

Laser-Doppler flowmetry has been used for the assessment of pulp blood flow in health and disease. General purpose laser Doppler instruments working at the Helium-Neon (632,8 nm) as well as IR (750 - 810 nm) wavelengths have been used in this application. Specially designed handheld equipment has also been used to assess blood supply to the tooth. A considerable difference in the measurement results have been noticed when using different wavelengths and probe designs. In this study some of the problems related to the use of various wavelengths and probe designs are studied in human teeth and in a physical model of a tooth. Our results support the early observation that measurements at different wavelengths and with different probe designs cannot be directly compared.

Assessment of a Low-Power 65 nm CMOS Technology for Analog Front-End Design

NASA Astrophysics Data System (ADS)

Manghisoni, Massimo; Gaioni, Luigi; Ratti, Lodovico; Re, Valerio; Traversi, Gianluca

2014-02-01

This work is concerned with the study of the analog properties of MOSFET devices belonging to a 65 nm CMOS technology with emphasis on intrinsic voltage gain and noise performance. This node appears to be a robust and promising solution to cope with the unprecedented requirements set by silicon vertex trackers in experiments upgrades and future colliders as well as by imaging detectors at light sources and free electron lasers. In this scaled-down technology, the impact of new dielectric materials and processing techniques on the analog behavior of MOSFETs has to be carefully evaluated. An inversion level design methodology has been adopted to analyze data obtained from device measurements and provide a powerful tool to establish design criteria for detector front-ends in this nanoscale CMOS process. A comparison with data coming from less scaled technologies, such as 90 nm and 130 nm nodes, is also provided and can be used to evaluate the resolution limits achievable for low-noise charge sensitive amplifiers in the 100 nm minimum feature size range.

Design of crossed planar phase grating for metrology

NASA Astrophysics Data System (ADS)

Tang, Yu; Chen, Xinrong; Li, Chaoming; Wang, Rui; Xu, Haiyan; Cheng, Yushui

2018-01-01

Crossed-grating is widely used as the standard element for metrology in two-dimensional precision positioning system. It has many advantages such as high resolution, compact structure, good environmental adaptability and less Abbe error. In this paper, the design of crossed planar reflecting phase grating used under the Littrow condition with circularly polarized light at 780nm wavelength has been carried out. The aim of the design is to find out the range of structure parameters of crossed-grating that has higher -1st order diffraction efficiency and good efficiency equilibrium for both of TE- and TM-polarized incident lights. By adoption of the Fourier modal method (FMM), the microstructure parameters of the 1200lines/mm crossed grating with the duty cycle range of 10% to 50% and the profile depth of 150nm to 350nm have been searched exactly. The calculation results show that: When the duty cycle range of the grating is 42% to 44% and profile depth is 210nm to 220nm, the -1st diffraction efficiencies of TE- and TM-polarized lights are both above 60% and the efficiency equilibrium is better than 80%.

Computational Design of High-χ Block Oligomers for Accessing 1 nm Domains.

PubMed

Chen, Qile P; Barreda, Leonel; Oquendo, Luis E; Hillmyer, Marc A; Lodge, Timothy P; Siepmann, J Ilja

2018-05-22

Molecular dynamics simulations are used to design a series of high-χ block oligomers (HCBOs) that can self-assemble into a variety of mesophases with domain sizes as small as 1 nm. The exploration of these oligomers with various chain lengths, volume fractions, and chain architectures at multiple temperatures reveals the presence of ordered lamellae, perforated lamellae, and hexagonally packed cylinders. The achieved periods are as small as 3.0 and 2.1 nm for lamellae and cylinders, respectively, which correspond to polar domains of approximately 1 nm. Interestingly, the detailed phase behavior of these oligomers is distinct from that of either solvent-free surfactants or block polymers. The simulations reveal that the behavior of these HCBOs is a product of an interplay between both "surfactant factors" (headgroup interactions, chain flexibility, and interfacial curvature) and "block polymer factors" (χ, chain length N, and volume fraction f). This insight promotes the understanding of molecular features pivotal for mesophase formation at the sub-5 nm length scale, which facilitates the design of HCBOs tailored toward particular desired morphologies.

A rule-based, dose-finding design for use in stroke rehabilitation research: methodological development.

PubMed

Colucci, E; Clark, A; Lang, C E; Pomeroy, V M

2017-12-01

Dose-optimisation studies as precursors to clinical trials are rare in stroke rehabilitation. To develop a rule-based, dose-finding design for stroke rehabilitation research. 3+3 rule-based, dose-finding study. Dose escalation/de-escalation was undertaken according to preset rules and a mathematical sequence (modified Fibonacci sequence). The target starting daily dose was 50 repetitions for the first cohort. Adherence was recorded by an electronic counter. At the end of the 2-week training period, the adherence record indicated dose tolerability (adherence to target dose) and the outcome measure indicated dose benefit (10% increase in motor function). The preset increment/decrease and checking rules were then applied to set the dose for the subsequent cohort. The process was repeated until preset stopping rules were met. Participants had a mean age of 68 (range 48 to 81) years, and were a mean of 70 (range 9 to 289) months post stroke with moderate upper limb paresis. A custom-built model of exercise-based training to enhance ability to open the paretic hand. Repetitions per minute of extension/flexion of paretic digits against resistance. Usability of the preset rules and whether the maximally tolerated dose was identifiable. Five cohorts of three participants were involved. Discernibly different doses were set for each subsequent cohort (i.e. 50, 100, 167, 251 and 209 repetitions/day). The maximally tolerated dose for the model training task was 209 repetitions/day. This dose-finding design is a feasible method for use in stroke rehabilitation research. Copyright © 2017 Chartered Society of Physiotherapy. All rights reserved.

75 FR 58456 - Self-Regulatory Organizations; Notice of Filing of Proposed Rule Change by New York Stock...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-09-24

... Commitment Schedule (``CCS'') of the Designated Market Maker provided for in NYSE Rule 1000(d)(i). The text..., if any, in the CCS of the Designated Market Maker. As the execution of the order proceeds, the... to DBK due to the possibility of interaction with CCS interest. Note that no orders were routed to...

77 FR 77151 - Self-Regulatory Organizations; NYSE Arca, Inc.; Notice of Designation of Longer Period for...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-12-31

... Organizations; NYSE Arca, Inc.; Notice of Designation of Longer Period for Commission Action on Proceedings To Determine Whether To Approve or Disapprove a Proposed Rule Change To List and Trade Shares of the iShares...,\\2\\ a proposed rule change to list and trade shares of the iShares Copper Trust (``Trust'') pursuant...

77 FR 71860 - Self-Regulatory Organizations; National Stock Exchange, Inc.; Notice of Designation of Longer...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-12-04

... SECURITIES AND EXCHANGE COMMISSION [Release No. 34-68312; File No. SR-NSX-2012-015] Self-Regulatory Organizations; National Stock Exchange, Inc.; Notice of Designation of Longer Period for Commission Action on a Proposed Rule Change Relating to Adoption of Listing Standards for Compensation Committees and Advisors as Required by Rule 10C-1...

77 FR 71852 - Self-Regulatory Organizations; Chicago Stock Exchange, Inc.; Notice of Designation of Longer...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-12-04

... SECURITIES AND EXCHANGE COMMISSION [Release No. 34-68311; File No. SR-CHX-2012-013] Self-Regulatory Organizations; Chicago Stock Exchange, Inc.; Notice of Designation of Longer Period for Commission Action on a Proposed Rule Change Relating to Adoption of Listing Standards for Compensation Committees and Advisors as Required by Rule 10C-1...

78 FR 8229 - Service Rules for Advanced Wireless Services in the 2000-2020 MHz and 2180-2200 MHz Bands, etc.

Federal Register 2010, 2011, 2012, 2013, 2014

2013-02-05

... issues unique to the particular spectrum bands. The proposed rules were designed to provide for flexible... included aggressive build-out requirements and concomitant penalties for failure to build out designed to... been ex parte presentations. III. Report and Order: AWS-4 7. In this AWS-4 Report and Order, we build...

26 CFR 1.403(b)-0 - Taxability under an annuity purchased by a section 501(c)(3) organization or a public school.

Code of Federal Regulations, 2013 CFR

2013-04-01

... for designated Roth section 403(b) contributions. (d) Effect of failure. § 1.403(b)-4Contribution... eligible plans. (f) Loans. (g) Death benefits and other incidental benefits. (h) Special rule regarding... under section 72(p)(1). (e) Special rules relating to distributions from a designated Roth account. (f...

78 FR 48214 - Self-Regulatory Organizations; The Options Clearing Corporation; Notice of Filing and Immediate...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-08-07

... and Rules to Certain U.S. Dollar-Settled Gold Futures Designed to Replicate Positions in the Spot... Futures That Were Based on the Value of Gold in the Spot Market With an Additional Daily Cost of Carry... Rules to certain U.S. dollar-settled gold futures designed to replicate positions in the spot market...

77 FR 33013 - Self-Regulatory Organizations; ICE Clear Credit LLC; Notice of Designation of a Longer Period for...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-06-04

... Organizations; ICE Clear Credit LLC; Notice of Designation of a Longer Period for Commission Action on Proposed Rule Change To Add Rules Related to the Clearing of Emerging Markets Sovereign Index Credit Default Swaps May 29, 2012. On April 3, 2012, ICE Clear Credit (``ICC'') filed with the Securities and Exchange...

Designing seasonal initial attack resource deployment and dispatch rules using a two-stage stochastic programming procedure

Treesearch

Yu Wei; Michael Bevers; Erin J. Belval

2015-01-01

Initial attack dispatch rules can help shorten fire suppression response times by providing easy-to-follow recommendations based on fire weather, discovery time, location, and other factors that may influence fire behavior and the appropriate response. A new procedure is combined with a stochastic programming model and tested in this study for designing initial attack...

Simulation-Based Rule Generation Considering Readability

PubMed Central

Yahagi, H.; Shimizu, S.; Ogata, T.; Hara, T.; Ota, J.

2015-01-01

Rule generation method is proposed for an aircraft control problem in an airport. Designing appropriate rules for motion coordination of taxiing aircraft in the airport is important, which is conducted by ground control. However, previous studies did not consider readability of rules, which is important because it should be operated and maintained by humans. Therefore, in this study, using the indicator of readability, we propose a method of rule generation based on parallel algorithm discovery and orchestration (PADO). By applying our proposed method to the aircraft control problem, the proposed algorithm can generate more readable and more robust rules and is found to be superior to previous methods. PMID:27347501

Design of polarization insensitive filters with micro- and nano-grating structures

NASA Astrophysics Data System (ADS)

Wang, Wen-liang; Rong, Xiao-hong

2014-03-01

For isotropic dielectric thin films, polarization effect is an inherent characteristic. As it will make the performance of optical-electric system go to bad, such polarization-dependent properties are often intolerable and should be eliminated in many applications. In this paper, based on a micro- and nano-optical structure whose period consists of four parts, a polarization insensitive filter is obtained by combining rigorous wave theory and multi-objective immune optimization algorithm. Its working wavelength is 1315 nm which is often used in laser systems. The results of our design show that TE and TM polarized waves have reflectivities of 0.482 and 0.485, respectively at designed wavelength of 1315 nm. And it denotes that two values are both close to the design values, their difference is only 0.003, and polarization deviation is also very little. Therefore, the designed filter can eliminate the effect of polarization deviation very well at 1315 nm wavelength.

New designs of a complete set of Photonic Crystals logic gates

NASA Astrophysics Data System (ADS)

Hussein, Hussein M. E.; Ali, Tamer A.; Rafat, Nadia H.

2018-03-01

In this paper, we introduce new designs of all-optical OR, AND, XOR, NOT, NOR, NAND and XNOR logic gates based on the interference effect. The designs are built using 2D square lattice Photonic Crystal (PhC) structure of dielectric rods embedded in air background. The lattice constant, a, and the rod radius, r, are designed to achieve maximum operating range of frequencies using the gap map. We use the Plane Wave Expansion (PWE) method to obtain the band structure and the gap map of the proposed designs. The operating wavelengths achieve a wide band range that varies between 1266.9 nm and 1996 nm with center wavelength at 1550 nm. The Finite-Difference Time-Domain (FDTD) method is used to study the field behavior inside the PhC gates. The gates satisfy their truth tables with reasonable power contrast ratio between logic '1' and logic '0'.

Design optimization of integrated BiDi triplexer optical filter based on planar lightwave circuit.

PubMed

Xu, Chenglin; Hong, Xiaobin; Huang, Wei-Ping

2006-05-29

Design optimization of a novel integrated bi-directional (BiDi) triplexer filter based on planar lightwave circuit (PLC) for fiber-to-the premise (FTTP) applications is described. A multi-mode interference (MMI) device is used to filter the up-stream 1310nm signal from the down-stream 1490nm and 1555nm signals. An array waveguide grating (AWG) device performs the dense WDM function by further separating the two down-stream signals. The MMI and AWG are built on the same substrate with monolithic integration. The design is validated by simulation, which shows excellent performance in terms of filter spectral characteristics (e.g., bandwidth, cross-talk, etc.) as well as insertion loss.

Design optimization of integrated BiDi triplexer optical filter based on planar lightwave circuit

NASA Astrophysics Data System (ADS)

Xu, Chenglin; Hong, Xiaobin; Huang, Wei-Ping

2006-05-01

Design optimization of a novel integrated bi-directional (BiDi) triplexer filter based on planar lightwave circuit (PLC) for fiber-to-the premise (FTTP) applications is described. A multi-mode interference (MMI) device is used to filter the up-stream 1310nm signal from the down-stream 1490nm and 1555nm signals. An array waveguide grating (AWG) device performs the dense WDM function by further separating the two down-stream signals. The MMI and AWG are built on the same substrate with monolithic integration. The design is validated by simulation, which shows excellent performance in terms of filter spectral characteristics (e.g., bandwidth, cross-talk, etc.) as well as insertion loss.

Experimental design rules for implementing biconically tapered single mode optical fibre displacement sensors

NASA Astrophysics Data System (ADS)

Arregui, Francisco J.; Matias, Ignacio R.; Bariain, Candido; Lopez-Amo, Manuel

1998-06-01

Tapered optical fibers are used to design couplers, wavelength division multiplexers, near field scanning optical microscopy, just to mention a few. Moreover, and due to its strong transmission dependence to external medium the tapered fiber may also be used to sense distinct parameters such as temperature, humidity, PH, etc. In this work bending effects in tapers are exploited to achieved displacement sensors and to present design rules for implementing these sensors according to the desired both range and sensitivity.

CD volume design and verification

NASA Technical Reports Server (NTRS)

Li, Y. P.; Hughes, J. S.

1993-01-01

In this paper, we describe a prototype for CD-ROM volume design and verification. This prototype allows users to create their own model of CD volumes by modifying a prototypical model. Rule-based verification of the test volumes can then be performed later on against the volume definition. This working prototype has proven the concept of model-driven rule-based design and verification for large quantity of data. The model defined for the CD-ROM volumes becomes a data model as well as an executable specification.

Ultra-low-loss and broadband mode converters in Si3N4 technology

NASA Astrophysics Data System (ADS)

Mu, Jinfeng; Dijkstra, Meindert; de Goede, Michiel; Yong, Yean-Sheng; García-Blanco, Sonia M.

2017-02-01

Si3N4 grown by low pressure chemical vapor deposition (LPCVD) on thermally oxidized silicon wafers is largely utilized for creating integrated photonic devices due to its ultra-low propagation loss and large transparency window (400 nm to 2350 nm). In this paper, an ultra-low-loss and broadband mode converter for monolithic integration of different materials onto the passive Si3N4 photonic technology platform is presented. The mode size converter is constructed with a vertically tapered Si3N4 waveguide that is then buried by a polymer or an Al2O3 waveguide. The influence of the various design parameters on the converter characteristics are investigated. Optimal designs are proposed, in which the thickness of the Si3N4 waveguide is tapered from 200 nm to 40 nm. The calculated losses of the mode converters at 976 nm and 1550 nm wavelengths are well below 0.1 dB for the Si3N4-polymer coupler and below 0.3 dB for the Si3N4-Al2O3 coupler. The preliminary experimental results show good agreement with the design values, indicating that the mode converters can be utilized for the low-loss integration of different materials.

Fiber-Based 589 nm Laser for Sodium Guide Star

DTIC Science & Technology

2006-02-01

are combined in a 980/1060 nm WDM coupler and free-space launched through an isolator designed for 1060 nm into a 23 m long Yb doped fiber. This fiber...lenses. The final-stage amplifier comprised a 23 m long YDF with a core diameter of 8 lam and a D-shaped inner cladding of 400 jtm diameter. It was...resolution). (b) High resolution spectrum of the 1178 nm output beam at 534 m W output power, linewidth (FWHM) - 0. 6 nm (0.05 nm resolution). The

Near-infrared lasers and self-frequency-doubling in Nd:YCOB cladding waveguides.

PubMed

Ren, Yingying; Chen, Feng; Vázquez de Aldana, Javier R

2013-05-06

A design of cladding waveguides in Nd:YCOB nonlinear crystals is demonstrated in this work. Compact Fabry-Perot oscillation cavities are employed for waveguide laser generation at 1062 nm and self-frequency-doubling at 531 nm, under optical pump at 810 nm. The waveguide laser shows slope efficiency as high as 55% at 1062 nm. The SFD green waveguide laser emits at 531 nm with a maximum power of 100 μW.

Explanation-based learning in infancy.

PubMed

Baillargeon, Renée; DeJong, Gerald F

2017-10-01

In explanation-based learning (EBL), domain knowledge is leveraged in order to learn general rules from few examples. An explanation is constructed for initial exemplars and is then generalized into a candidate rule that uses only the relevant features specified in the explanation; if the rule proves accurate for a few additional exemplars, it is adopted. EBL is thus highly efficient because it combines both analytic and empirical evidence. EBL has been proposed as one of the mechanisms that help infants acquire and revise their physical rules. To evaluate this proposal, 11- and 12-month-olds (n = 260) were taught to replace their current support rule (that an object is stable when half or more of its bottom surface is supported) with a more sophisticated rule (that an object is stable when half or more of the entire object is supported). Infants saw teaching events in which asymmetrical objects were placed on a base, followed by static test displays involving a novel asymmetrical object and a novel base. When the teaching events were designed to facilitate EBL, infants learned the new rule with as few as two (12-month-olds) or three (11-month-olds) exemplars. When the teaching events were designed to impede EBL, however, infants failed to learn the rule. Together, these results demonstrate that even infants, with their limited knowledge about the world, benefit from the knowledge-based approach of EBL.

78 FR 12108 - Proposed Collection; Comment Request

Federal Register 2010, 2011, 2012, 2013, 2014

2013-02-21

... rule proposal methods. The FOCUS Report was designed to eliminate the overlapping regulatory reports..., Washington, DC 20549-0213. Extension: Rule 17a-5; SEC File No. 270-155, OMB Control No. 3235-0123. Notice is... information provided for in Rule 17a-5 (17 CFR 240.17a- 5), under the Securities Exchange Act of 1934 (15 U.S...

17 CFR 151.11 - Designated contract market and swap execution facility position limits and accountability rules.

Code of Federal Regulations, 2014 CFR

2014-04-01

.... (a) Spot-month limits. (1) For all Referenced Contracts executed pursuant to their rules, swap..., establish rules and procedures for monitoring and enforcing spot-month position limits set at levels no... monitoring and enforcing spot-month position limits set at levels no greater than 25 percent of estimated...

42 CFR 422.314 - Special rules for beneficiaries enrolled in MA MSA plans.

Code of Federal Regulations, 2012 CFR

2012-10-01

... 42 Public Health 3 2012-10-01 2012-10-01 false Special rules for beneficiaries enrolled in MA MSA... Medicare Advantage Organizations § 422.314 Special rules for beneficiaries enrolled in MA MSA plans. (a) Establishment and designation of medical savings account (MSA). A beneficiary who elects coverage under an MA...

42 CFR 422.314 - Special rules for beneficiaries enrolled in MA MSA plans.

Code of Federal Regulations, 2013 CFR

2013-10-01

... 42 Public Health 3 2013-10-01 2013-10-01 false Special rules for beneficiaries enrolled in MA MSA... Medicare Advantage Organizations § 422.314 Special rules for beneficiaries enrolled in MA MSA plans. (a) Establishment and designation of medical savings account (MSA). A beneficiary who elects coverage under an MA...

42 CFR 422.314 - Special rules for beneficiaries enrolled in MA MSA plans.

Code of Federal Regulations, 2014 CFR

2014-10-01

... 42 Public Health 3 2014-10-01 2014-10-01 false Special rules for beneficiaries enrolled in MA MSA... Medicare Advantage Organizations § 422.314 Special rules for beneficiaries enrolled in MA MSA plans. (a) Establishment and designation of medical savings account (MSA). A beneficiary who elects coverage under an MA...

77 FR 35446 - Self-Regulatory Organizations; BATS Exchange, Inc.; Notice of Filing and Immediate Effectiveness...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-06-13

..., maintain, and enforce certain written policies and procedures reasonably designed to comply with the rule...'') (amending Rules 201 and 200 of Regulation SHO to adopt a short sale price test restriction and ``short...'' functionality in connection with the short sale price test restriction; see also, Rule 11.13, which codifies in...

77 FR 61457 - Self-Regulatory Organizations; NYSE Arca, Inc.; Notice of Designation of Longer Period for...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-10-09

... Physical Copper Trust Pursuant To NYSE Arca Equities Rule 8.201 October 2, 2012. On April 2, 2012, NYSE... Copper Trust (``Trust'') pursuant to NYSE Arca Equities Rule 8.201. The proposed rule change was..., Director of Purchasing, Encore Wire Corporation; Ron Beal, Executive Vice President, Tubes Division, Luvata...

Use of an Explicit Rule Decreases Procrastination in University Students

ERIC Educational Resources Information Center

Johnson, Paul E.; Perrin, Christopher J.; Salo, Allen; Deschaine, Elyssa; Johnson, Beth

2016-01-01

The procrastination behavior of students from a small rural university was decreased by presenting them with a rule indicating that a sooner final due date for a writing assignment would be contingent on procrastination during earlier phases of the paper. A counterbalanced AB BA design was used to measure the effects of the rule-based treatment…

19 CFR 181.93 - Submission of advance ruling requests.

Code of Federal Regulations, 2010 CFR

2010-04-01

... commercial, common, or technical designation of the good or material; if the good or material is composed of... name of the port or place at which any good involved in the transaction will be imported or which will... ruling. Where the request for an advance ruling is submitted by or on behalf of the importer of the good...

19 CFR 181.93 - Submission of advance ruling requests.

Code of Federal Regulations, 2011 CFR

2011-04-01

... commercial, common, or technical designation of the good or material; if the good or material is composed of... name of the port or place at which any good involved in the transaction will be imported or which will... ruling. Where the request for an advance ruling is submitted by or on behalf of the importer of the good...

77 FR 50907 - Airspace Designations; Incorporation by Reference

Federal Register 2010, 2011, 2012, 2013, 2014

2012-08-23

... FAA processed all proposed changes of the airspace listings in FAA Order 7400.9V in full text as... in full text as final rules in the Federal Register. This rule reflects the periodic integration of... changes of the airspace listings in FAA Order 7400.9W in full text as proposed rule documents in the...

78 FR 52847 - Airspace Designations; Incorporation by Reference

Federal Register 2010, 2011, 2012, 2013, 2014

2013-08-27

... FAA processed all proposed changes of the airspace listings in FAA Order 7400.9W in full text as... in full text as final rules in the Federal Register. This rule reflects the periodic integration of... changes of the airspace listings in FAA Order 7400.9X in full text as proposed rule documents in the...

77 FR 77156 - Self-Regulatory Organizations; ICE Clear Credit LLC; Notice of Filing and Immediate Effectiveness...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-12-31

... other things, that the rules of a clearing agency be designed to promote the prompt and accurate... the Commission's Internet comment form ( http://www.sec.gov/rules/sro.shtml ), or Send an email to... all comments on the Commission's Internet Web site ( http://www.sec.gov/rules/sro.shtml ). Copies of...

Service without a Smile: Comparing the Consequences of Neutral and Positive Display Rules

ERIC Educational Resources Information Center

Trougakos, John P.; Jackson, Christine L.; Beal, Daniel J.

2011-01-01

We used an experimental design to examine the intrapersonal and interpersonal processes through which neutral display rules, compared to positive display rules, influence objective task performance of poll workers and ratings provided by survey respondents of the poll workers. Student participants (N = 140) were trained to adhere to 1 of the 2…

Interactions of double patterning technology with wafer processing, OPC and design flows

NASA Astrophysics Data System (ADS)

Lucas, Kevin; Cork, Chris; Miloslavsky, Alex; Luk-Pat, Gerry; Barnes, Levi; Hapli, John; Lewellen, John; Rollins, Greg; Wiaux, Vincent; Verhaegen, Staf

2008-03-01

Double patterning technology (DPT) is one of the main options for printing logic devices with half-pitch less than 45nm; and flash and DRAM memory devices with half-pitch less than 40nm. DPT methods decompose the original design intent into two individual masking layers which are each patterned using single exposures and existing 193nm lithography tools. The results of the individual patterning layers combine to re-create the design intent pattern on the wafer. In this paper we study interactions of DPT with lithography, masks synthesis and physical design flows. Double exposure and etch patterning steps create complexity for both process and design flows. DPT decomposition is a critical software step which will be performed in physical design and also in mask synthesis. Decomposition includes cutting (splitting) of original design intent polygons into multiple polygons where required; and coloring of the resulting polygons. We evaluate the ability to meet key physical design goals such as: reduce circuit area; minimize rework; ensure DPT compliance; guarantee patterning robustness on individual layer targets; ensure symmetric wafer results; and create uniform wafer density for the individual patterning layers.

Optical design and system calibration for three-band spectral imaging system with interchangeable filters

USDA-ARS?s Scientific Manuscript database

The design and calibration of a three-band image acquisition system was reported. The prototype system developed in this research was a three-band spectral imaging system that acquired two visible (510 and 568 nm) images and a near-infrared (NIR) (800 nm) image simultaneously. The system was proto...

20-W 1952-nm tandem hybrid single and double clad TDFA

NASA Astrophysics Data System (ADS)

Romano, Clément; Tench, Robert E.; Delavaux, Jean-Marc

2018-02-01

A simple engineering design is important for achieving high Thulium-doped amplifier (TDFA) performance such as good power conversion, low noise figure (NF), scalable output power, high gain, and stable operation over a large dynamic range. In this paper we report the design, performance, and simulation of two stage high-power 1952 nm hybrid single and double clad TDFAs. The first stage of our hybrid amplifier is a single clad design, and the second stage is a double clad design. We demonstrate TDFAs with an output power greater than 20 W with single-frequency narrow linewidth (i.e. MHz) input signals at both 1952 and 2004 nm. An optical 10 dB bandwidth of 80 nm is derived from the ASE spectrum. The power stage is constructed with 10 μm core active fibers showing a maximum optical slope efficiency greater than 50 %. The experimental results lead to a 1 dB agreement with our simulation tool developed for single clad and double clad TDFAs. Overall this hybrid amplifier offers versatile features with the potential of much higher output power.

Design of a broadband reciprocal optical diode in multimode silicon waveguide by partial depth etching

NASA Astrophysics Data System (ADS)

Zhu, Danfeng; Zhang, Jinqiannan; Ye, Han; Yu, Zhongyuan; Liu, Yumin

2018-07-01

We propose a design of reciprocal optical diode based on asymmetric spatial mode conversion in multimode silicon waveguide on the silicon-on-insulator platform. The design possesses large bandwidth, high contrast ratio and high fabrication tolerance. The forward even-to-odd mode conversion and backward blockade of even mode are achieved by partial depth etching in the functional region. Simulated by three-dimension finite-difference time-domain method, the forward transmission efficiency is about -2.05 dB while the backward transmission efficiency is only -22.68 dB, reaching a highest contrast ratio of 0.983 at the wavelength of 1550 nm. The operational bandwidth is up to 200 nm (from 1450 nm to 1650 nm) with contrast ratio higher than 0.911. The numerical analysis also demonstrates that the proposed optical diode possesses high tolerance for geometry parameter errors which may be introduced in fabrication. The design based on partial depth etching is compatible with CMOS process and is expected to contribute to the silicon-based all-optical circuits.

Design of a miniaturized integrated spectrometer for spectral tissue sensing

NASA Astrophysics Data System (ADS)

Belay, Gebirie Yizengaw; Hoving, Willem; Ottevaere, Heidi; van der Put, Arthur; Weltjens, Wim; Thienpont, Hugo

2016-04-01

Minimally-invasive image-guided procedures become increasingly used by physicians to obtain real-time characterization feedback from the tissue at the tip of their interventional device (needle, catheter, endoscopic or laparoscopic probes, etc…) which can significantly improve the outcome of diagnosis and treatment, and ultimately reduce cost of the medical treatment. Spectral tissue sensing using compact photonic probes has the potential to be a valuable tool for screening and diagnostic purposes, e.g. for discriminating between healthy and tumorous tissue. However, this technique requires a low-cost broadband miniature spectrometer so that it is commercially viable for screening at point-of-care locations such as physicians' offices and outpatient centers. Our goal is therefore to develop a miniaturized spectrometer based on diffractive optics that combines the functionalities of a visible/near-infrared (VIS/NIR) and shortwave-infrared (SWIR) spectrometer in one very compact housing. A second goal is that the hardware can be produced in high volume at low cost without expensive time consuming alignment and calibration steps. We have designed a miniaturized spectrometer which operates both in the visible/near-infrared and shortwave-infrared wavelength regions ranging from 400 nm to 1700 nm. The visible/near-infrared part of the spectrometer is designed for wavelengths from 400 nm to 800 nm whereas the shortwave-infrared segment ranges from 850 nm to 1700 nm. The spectrometer has a resolution of 6 nm in the visible/near-infrared wavelength region and 10 nm in the shortwave-infrared. The minimum SNR of the spectrometer for the intended application is about 151 in the VIS/NIR range and 6000 for SWIR. In this paper, the modelling and design, and power budget analysis of the miniaturized spectrometer are presented. Our work opens a door for future affordable micro- spectrometers which can be integrated with smartphones and tablets, and used for point-of-care applications. As next steps in the development, we will manufacture the different optical components and experimentally characterize the spectrometer device in more detail.

Optimization design of the tuning method for FBG spectroscopy based on the numerical analysis of all-fiber Raman temperature lidar

NASA Astrophysics Data System (ADS)

Wang, Li; Wang, Jun; Bao, Dong; Yang, Rong; Yan, Qing; Gao, Fei; Hua, Dengxin

2018-01-01

All fiber Raman temperature lidar for space borne platform has been proposed for profiling of the temperature with high accuracy. Fiber Bragg grating (FBG) is proposed as the spectroscopic system of Raman lidar because of good wavelength selectivity, high spectral resolution and high out-of-band rejection rate. Two sets of FBGs at visible wavelength 532 nm as Raman spectroscopy system are designed for extracting the rotational Raman spectra of atmospheric molecules, which intensities depend on the atmospheric temperature. The optimization design of the tuning method of an all-fiber rotational Raman spectroscopy system is analyzed and tested for estimating the potential temperature inversion error caused by the instability of FBG. The cantilever structure with temperature control device is designed to realize the tuning and stabilization of the central wavelengths of FBGs. According to numerical calculation of FBG and finite element analysis of the cantilever structure, the center wavelength offset of FBG is 11.03 nm/°C with the temperature change in the spectroscopy system. By experimental observation, the center wavelength offset of surface-bonded FBG is 9.80 nm/°C with temperature changing when subjected to certain strain for the high quantum number channel, while 10.01 nm/°C for the low quantum number channel. The tunable wavelength range of FBG is from 528.707 nm to 529.014 nm for the high quantum number channel and from 530.226 nm to 530.547 nm for the low quantum number channel. The temperature control accuracy of the FBG spectroscopy system is up to 0.03 °C, the corresponding potential atmospheric temperature inversion error is 0.04 K based on the numerical analysis of all-fiber Raman temperature lidar. The fine tuning and stabilization of the FBG wavelength realize the elaborate spectroscope of Raman lidar system. The conclusion is of great significance for the application of FBG spectroscopy system for space-borne platform Raman lidar.

Design of 240,000 orthogonal 25mer DNA barcode probes.

PubMed

Xu, Qikai; Schlabach, Michael R; Hannon, Gregory J; Elledge, Stephen J

2009-02-17

DNA barcodes linked to genetic features greatly facilitate screening these features in pooled formats using microarray hybridization, and new tools are needed to design large sets of barcodes to allow construction of large barcoded mammalian libraries such as shRNA libraries. Here we report a framework for designing large sets of orthogonal barcode probes. We demonstrate the utility of this framework by designing 240,000 barcode probes and testing their performance by hybridization. From the test hybridizations, we also discovered new probe design rules that significantly reduce cross-hybridization after their introduction into the framework of the algorithm. These rules should improve the performance of DNA microarray probe designs for many applications.

Design of 240,000 orthogonal 25mer DNA barcode probes

PubMed Central

Xu, Qikai; Schlabach, Michael R.; Hannon, Gregory J.; Elledge, Stephen J.

2009-01-01

DNA barcodes linked to genetic features greatly facilitate screening these features in pooled formats using microarray hybridization, and new tools are needed to design large sets of barcodes to allow construction of large barcoded mammalian libraries such as shRNA libraries. Here we report a framework for designing large sets of orthogonal barcode probes. We demonstrate the utility of this framework by designing 240,000 barcode probes and testing their performance by hybridization. From the test hybridizations, we also discovered new probe design rules that significantly reduce cross-hybridization after their introduction into the framework of the algorithm. These rules should improve the performance of DNA microarray probe designs for many applications. PMID:19171886

ITER structural design criteria and their extension to advanced reactor blankets*1

NASA Astrophysics Data System (ADS)

Majumdar, S.; Kalinin, G.

2000-12-01

Applications of the recent ITER structural design criteria (ISDC) are illustrated by two components. First, the low-temperature-design rules are applied to copper alloys that are particularly prone to irradiation embrittlement at relatively low fluences at certain temperatures. Allowable stresses are derived and the impact of the embrittlement on allowable surface heat flux of a simple first-wall/limiter design is demonstrated. Next, the high-temperature-design rules of ISDC are applied to evaporation of lithium and vapor extraction (EVOLVE), a blanket design concept currently being investigated under the US Advanced Power Extraction (APEX) program. A single tungsten first-wall tube is considered for thermal and stress analyses by finite-element method.

EUV mask manufacturing readiness in the merchant mask industry

NASA Astrophysics Data System (ADS)

Green, Michael; Choi, Yohan; Ham, Young; Kamberian, Henry; Progler, Chris; Tseng, Shih-En; Chiou, Tsann-Bim; Miyazaki, Junji; Lammers, Ad; Chen, Alek

2017-10-01

As nodes progress into the 7nm and below regime, extreme ultraviolet lithography (EUVL) becomes critical for all industry participants interested in remaining at the leading edge. One key cost driver for EUV in the supply chain is the reflective EUV mask. As of today, the relatively few end users of EUV consist primarily of integrated device manufactures (IDMs) and foundries that have internal (captive) mask manufacturing capability. At the same time, strong and early participation in EUV by the merchant mask industry should bring value to these chip makers, aiding the wide-scale adoption of EUV in the future. For this, merchants need access to high quality, representative test vehicles to develop and validate their own processes. This business circumstance provides the motivation for merchants to form Joint Development Partnerships (JDPs) with IDMs, foundries, Original Equipment Manufacturers (OEMs) and other members of the EUV supplier ecosystem that leverage complementary strengths. In this paper, we will show how, through a collaborative supplier JDP model between a merchant and OEM, a novel, test chip driven strategy is applied to guide and validate mask level process development. We demonstrate how an EUV test vehicle (TV) is generated for mask process characterization in advance of receiving chip maker-specific designs. We utilize the TV to carry out mask process "stress testing" to define process boundary conditions which can be used to create Mask Rule Check (MRC) rules as well as serve as baseline conditions for future process improvement. We utilize Advanced Mask Characterization (AMC) techniques to understand process capability on designs of varying complexity that include EUV OPC models with and without sub-resolution assist features (SRAFs). Through these collaborations, we demonstrate ways to develop EUV processes and reduce implementation risks for eventual mass production. By reducing these risks, we hope to expand access to EUV mask capability for the broadest community possible as the technology is implemented first within and then beyond the initial early adopters.

Automatic design of magazine covers

NASA Astrophysics Data System (ADS)

Jahanian, Ali; Liu, Jerry; Tretter, Daniel R.; Lin, Qian; Damera-Venkata, Niranjan; O'Brien-Strain, Eamonn; Lee, Seungyon; Fan, Jian; Allebach, Jan P.

2012-03-01

In this paper, we propose a system for automatic design of magazine covers that quantifies a number of concepts from art and aesthetics. Our solution to automatic design of this type of media has been shaped by input from professional designers, magazine art directors and editorial boards, and journalists. Consequently, a number of principles in design and rules in designing magazine covers are delineated. Several techniques are derived and employed in order to quantify and implement these principles and rules in the format of a software framework. At this stage, our framework divides the task of design into three main modules: layout of magazine cover elements, choice of color for masthead and cover lines, and typography of cover lines. Feedback from professional designers on our designs suggests that our results are congruent with their intuition.

An expert system design to diagnose cancer by using a new method reduced rule base.

PubMed

Başçiftçi, Fatih; Avuçlu, Emre

2018-04-01

A Medical Expert System (MES) was developed which uses Reduced Rule Base to diagnose cancer risk according to the symptoms in an individual. A total of 13 symptoms were used. With the new MES, the reduced rules are controlled instead of all possibilities (2 13 = 8192 different possibilities occur). By controlling reduced rules, results are found more quickly. The method of two-level simplification of Boolean functions was used to obtain Reduced Rule Base. Thanks to the developed application with the number of dynamic inputs and outputs on different platforms, anyone can easily test their own cancer easily. More accurate results were obtained considering all the possibilities related to cancer. Thirteen different risk factors were determined to determine the type of cancer. The truth table produced in our study has 13 inputs and 4 outputs. The Boolean Function Minimization method is used to obtain less situations by simplifying logical functions. Diagnosis of cancer quickly thanks to control of the simplified 4 output functions. Diagnosis made with the 4 output values obtained using Reduced Rule Base was found to be quicker than diagnosis made by screening all 2 13 = 8192 possibilities. With the improved MES, more probabilities were added to the process and more accurate diagnostic results were obtained. As a result of the simplification process in breast and renal cancer diagnosis 100% diagnosis speed gain, in cervical cancer and lung cancer diagnosis rate gain of 99% was obtained. With Boolean function minimization, less number of rules is evaluated instead of evaluating a large number of rules. Reducing the number of rules allows the designed system to work more efficiently and to save time, and facilitates to transfer the rules to the designed Expert systems. Interfaces were developed in different software platforms to enable users to test the accuracy of the application. Any one is able to diagnose the cancer itself using determinative risk factors. Thereby likely to beat the cancer with early diagnosis. Copyright © 2018 Elsevier B.V. All rights reserved.

Monoacylglycerol lipase inhibition by organophosphorus compounds leads to elevation of brain 2-arachidonoylglycerol and the associated hypomotility in mice

DOE Office of Scientific and Technical Information (OSTI.GOV)

Quistad, Gary B.; Klintenberg, Rebecka; Caboni, Pierluigi

2006-02-15

Three components of the cannabinoid system are sensitive to selected organophosphorus (OP) compounds: monoacylglycerol (MAG) lipase that hydrolyzes the major endogenous agonist 2-arachidonoylglycerol (2-AG); fatty acid amide hydrolase (FAAH) that cleaves the agonist anandamide present in smaller amounts; the CB1 receptor itself. This investigation considers which component of the cannabinoid system is the most likely contributor to OP-induced hypomotility in mice. Structure-activity studies by our laboratory and others rule against major involvement of a direct toxicant-CB1 receptor interaction for selected OPs. Attention was therefore focused on the OP sensitivities of MAG lipase and FAAH, assaying 19 structurally diverse OP chemicalsmore » (pesticides, their metabolites and designer compounds) for in vitro inhibition of both enzymes. Remarkably high potency and low selectivity is observed with three O-alkyl (C{sub 1}, C{sub 2}, C{sub 3}) alkylphosphonofluoridates (C{sub 8}, C{sub 12}) (IC50 0.60-3.0 nM), five S-alkyl (C{sub 5}, C{sub 7}, C{sub 9}) and alkyl (C{sub 1}, C{sub 12}) benzodioxaphosphorin oxides (IC50 0.15-5.7 nM) and one OP insecticide metabolite (chlorpyrifos oxon, IC50 34-40 nM). In ip-treated mice, the OPs at 1-30 mg/kg more potently inhibit brain FAAH than MAG lipase, but FAAH inhibition is not correlated with hypomotility. However, the alkylphosphonofluoridate-treated mice show dose-dependent increases in severity of hypomotility, inhibition of MAG lipase activity and elevation of 2-AG. Moderate to severe hypomotility is accompanied by 64 to 86% MAG lipase inhibition and about 6-fold elevation of brain 2-AG level. It therefore appears that OP-induced MAG lipase inhibition leads to elevated 2-AG and the associated hypomotility.« less

Spectral domain, common path OCT in a handheld PIC based system

NASA Astrophysics Data System (ADS)

Leinse, Arne; Wevers, Lennart; Marchenko, Denys; Dekker, Ronald; Heideman, René G.; Ruis, Roosje M.; Faber, Dirk J.; van Leeuwen, Ton G.; Kim, Keun Bae; Kim, Kyungmin

2018-02-01

Optical Coherence Tomography (OCT) has made it into the clinic in the last decade with systems based on bulk optical components. The next disruptive step will be the introduction of handheld OCT systems. Photonic Integrated Circuit (PIC) technology is the key enabler for this further miniaturization. PIC technology allows signal processing on a stable platform and the implementation of a common path interferometer in that same platform creates a robust fully integrated OCT system with a flexible fiber probe. In this work the first PIC based handheld and integrated common path based spectral domain OCT system is described and demonstrated. The spectrometer in the system is based on an Arrayed Waveguide Grating (AWG) and fully integrated with the CCD and a fiber probe into a system operating at 850 nm. The AWG on the PIC creates a 512 channel spectrometer with a resolution of 0.22 nm enabling a high speed analysis of the full A-scan. The silicon nitride based proprietary waveguide technology (TriPleXTM) enables low loss complex photonic structures from the visible (405 nm) to IR (2350 nm) range, making it a unique candidate for OCT applications. Broadband AWG operation from visible to 1700 nm has been shown in the platform and Photonic Design Kits (PDK) are available enabling custom made designs in a system level design environment. This allows a low threshold entry for designing new (OCT) designs for a broad wavelength range.

Accelerating clinical development of HIV vaccine strategies: methodological challenges and considerations in constructing an optimised multi-arm phase I/II trial design.

PubMed

Richert, Laura; Doussau, Adélaïde; Lelièvre, Jean-Daniel; Arnold, Vincent; Rieux, Véronique; Bouakane, Amel; Lévy, Yves; Chêne, Geneviève; Thiébaut, Rodolphe

2014-02-26

Many candidate vaccine strategies against human immunodeficiency virus (HIV) infection are under study, but their clinical development is lengthy and iterative. To accelerate HIV vaccine development optimised trial designs are needed. We propose a randomised multi-arm phase I/II design for early stage development of several vaccine strategies, aiming at rapidly discarding those that are unsafe or non-immunogenic. We explored early stage designs to evaluate both the safety and the immunogenicity of four heterologous prime-boost HIV vaccine strategies in parallel. One of the vaccines used as a prime and boost in the different strategies (vaccine 1) has yet to be tested in humans, thus requiring a phase I safety evaluation. However, its toxicity risk is considered minimal based on data from similar vaccines. We newly adapted a randomised phase II trial by integrating an early safety decision rule, emulating that of a phase I study. We evaluated the operating characteristics of the proposed design in simulation studies with either a fixed-sample frequentist or a continuous Bayesian safety decision rule and projected timelines for the trial. We propose a randomised four-arm phase I/II design with two independent binary endpoints for safety and immunogenicity. Immunogenicity evaluation at trial end is based on a single-stage Fleming design per arm, comparing the observed proportion of responders in an immunogenicity screening assay to an unacceptably low proportion, without direct comparisons between arms. Randomisation limits heterogeneity in volunteer characteristics between arms. To avoid exposure of additional participants to an unsafe vaccine during the vaccine boost phase, an early safety decision rule is imposed on the arm starting with vaccine 1 injections. In simulations of the design with either decision rule, the risks of erroneous conclusions were controlled <15%. Flexibility in trial conduct is greater with the continuous Bayesian rule. A 12-month gain in timelines is expected by this optimised design. Other existing designs such as bivariate or seamless phase I/II designs did not offer a clear-cut alternative. By combining phase I and phase II evaluations in a multi-arm trial, the proposed optimised design allows for accelerating early stage clinical development of HIV vaccine strategies.

Eu(2+)-Activated Alkaline-Earth Halophosphates, M5(PO4)3X:Eu(2+) (M = Ca, Sr, Ba; X = F, Cl, Br) for NUV-LEDs: Site-Selective Crystal Field Effect.

PubMed

Kim, Donghyeon; Kim, Sung-Chul; Bae, Jong-Seong; Kim, Sungyun; Kim, Seung-Joo; Park, Jung-Chul

2016-09-06

Eu(2+)-activated M5(PO4)3X (M = Ca, Sr, Ba; X = F, Cl, Br) compounds providing different alkaline-earth metal and halide ions were successfully synthesized and characterized. The emission peak maxima of the M5(PO4)3Cl:Eu(2+) (M = Ca, Sr, Ba) compounds were blue-shifted from Ca to Ba (454 nm for Ca, 444 nm for Sr, and 434 nm for Ba), and those of the Sr5(PO4)3X:Eu(2+) (X = F, Cl, Br) compounds were red-shifted along the series of halides, F → Cl → Br (437 nm for F, 444 nm for Cl, and 448 nm for Br). The site selectivity and occupancy of the activator ions (Eu(2+)) in the M5(PO4)3X:Eu(2+) (M = Ca, Sr, Ba; X = F, Cl, Br) crystal lattices were estimated based on theoretical calculation of the 5d → 4f transition energies of Eu(2+) using LCAO. In combination with the photoluminescence measurements and theoretical calculation, it was elucidated that the Eu(2+) ions preferably enter the fully oxygen-coordinated sites in the M5(PO4)3X:Eu(2+) (M = Ca, Sr, Ba; X = F, Cl, Br) compounds. This trend can be well explained by "Pauling's rules". These compounds may provide a platform for modeling a new phosphor and application in the solid-state lighting field.

Design and Analysis of Complex D-Regions in Reinforced Concrete Structures

ERIC Educational Resources Information Center

Yindeesuk, Sukit

2009-01-01

STM design provisions, such as those in Appendix A of ACI318-08, consist of rules for evaluating the capacity of the load-resisting truss that is idealized to carry the forces through the D-Region. These code rules were primarily derived from test data on simple D-Regions such as deep beams and corbels. However, these STM provisions are taken as…

17 CFR Appendix C to Part 30 - Foreign Petitioners Granted Relief From the Application of Certain of the Part 30 Rules Pursuant...

Code of Federal Regulations, 2010 CFR

2010-04-01

... Commodity and Securities Exchanges COMMODITY FUTURES TRADING COMMISSION FOREIGN FUTURES AND FOREIGN OPTIONS..., 1995, 60 FR 30466. Firms designated by the New Zealand Futures and Options Exchange (“NZFOE”). FR date... Certain of the Part 30 Rules Pursuant to § 30.10 Firms designated by the Sydney Futures Exchange Limited...

77 FR 50740 - Self-Regulatory Organizations; EDGA Exchange, Inc.; Notice of Designation of a Longer Period for...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-08-22

... SECURITIES AND EXCHANGE COMMISSION [Release No. 34-67677; File No. SR-EDGA-2012-28] Self-Regulatory Organizations; EDGA Exchange, Inc.; Notice of Designation of a Longer Period for Commission Action on Proposed Rule Change To Amend EDGA Rules To Add the Route Peg Order August 16, 2012. On June 26, 2012, EDGA Exchange, Inc. (``Exchange'') filed...

78 FR 29406 - Self-Regulatory Organizations; New York Stock Exchange LLC; NYSE MKT LLC; Notice of Designation...

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2013-05-20

... SECURITIES AND EXCHANGE COMMISSION [Release No. 34-69575; File Nos. SR-NYSE-2012-57; SR-NYSEMKT-2012-58] Self-Regulatory Organizations; New York Stock Exchange LLC; NYSE MKT LLC; Notice of Designation of Longer Period for Commission Action on Proceedings To Determine Whether To Disapprove Proposed Rule Changes Deleting NYSE Rules 95(c) and (d)...

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Federal Register 2010, 2011, 2012, 2013, 2014

2012-08-22

... SECURITIES AND EXCHANGE COMMISSION [Release No. 34-67676; File No. SR-EDGX-2012-25] Self-Regulatory Organizations; EDGX Exchange, Inc.; Notice of Designation of a Longer Period for Commission Action on Proposed Rule Change To Amend EDGX Rules To Add the Route Peg Order August 16, 2012. On June 26, 2012, EDGX Exchange, Inc. (``Exchange'') filed...

77 FR 66896 - Self-Regulatory Organizations; NYSE MKT LLC; Notice of Designation of a Longer Period for...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-11-07

... SECURITIES AND EXCHANGE COMMISSION [Release No. 34-68135; File No. SR-NYSEMKT-2012-41] Self-Regulatory Organizations; NYSE MKT LLC; Notice of Designation of a Longer Period for Commission Action on Proposed Rule Change To Amend Commentary .04 to NYSE Amex Options Rule 903 To Permit the Exchange To List Additional Strike Prices Until the Close of...

77 FR 66896 - Self-Regulatory Organizations; NYSE Arca, Inc.; Notice of Designation of a Longer Period for...

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2012-11-07

... SECURITIES AND EXCHANGE COMMISSION [Release No. 34-68136; File No. SR-NYSEArca-2012-94] Self-Regulatory Organizations; NYSE Arca, Inc.; Notice of Designation of a Longer Period for Commission Action on Proposed Rule Change To Amend Commentary .06 to NYSE Arca Options Rule 6.4 To Permit the Exchange To List Additional Strike Prices Until the Clos...

77 FR 77152 - Self-Regulatory Organizations; NYSE MKT LLC; Notice of Designation of a Longer Period for...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-12-31

... SECURITIES AND EXCHANGE COMMISSION [Release No. 34-68521; File No. SR-NYSEMKT-2012-58] Self-Regulatory Organizations; NYSE MKT LLC; Notice of Designation of a Longer Period for Commission Action on Proposed Rule Change Deleting NYSE MKT Rules 95(c) and (d)--Equities and Related Supplementary Material December 21, 2012. On October 26, 2012, NYSE...

77 FR 77160 - Self-Regulatory Organizations; New York Stock Exchange LLC; Notice of Designation of a Longer...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-12-31

... SECURITIES AND EXCHANGE COMMISSION [Release No. 34-68522; File No. SR-NYSE-2012-57] Self-Regulatory Organizations; New York Stock Exchange LLC; Notice of Designation of a Longer Period for Commission Action on Proposed Rule Change Deleting NYSE Rules 95(c) and (d) and Related Supplementary Material December 21, 2012. On October 26, 2012, New Yor...

46 CFR 69.65 - Calculation of volumes.

Code of Federal Regulations, 2010 CFR

2010-10-01

... buoyancy) are reasonably available, Simpson's first rule may be applied using those sections. (2) If the... is of conventional design with faired lines, Simpson's first rule may be applied using a number and...

46 CFR 69.65 - Calculation of volumes.

Code of Federal Regulations, 2011 CFR

2011-10-01

... buoyancy) are reasonably available, Simpson's first rule may be applied using those sections. (2) If the... is of conventional design with faired lines, Simpson's first rule may be applied using a number and...

14 CFR 93.125 - Arrival or departure reservation.

Code of Federal Regulations, 2010 CFR

2010-01-01

... (CONTINUED) AIR TRAFFIC AND GENERAL OPERATING RULES SPECIAL AIR TRAFFIC RULES High Density Traffic Airports... may operate an aircraft to or from an airport designated as a high density traffic airport unless he...

14 CFR 93.125 - Arrival or departure reservation.

Code of Federal Regulations, 2014 CFR

2014-01-01

... (CONTINUED) AIR TRAFFIC AND GENERAL OPERATING RULES SPECIAL AIR TRAFFIC RULES High Density Traffic Airports... may operate an aircraft to or from an airport designated as a high density traffic airport unless he...

14 CFR 93.125 - Arrival or departure reservation.

Code of Federal Regulations, 2011 CFR

2011-01-01

... (CONTINUED) AIR TRAFFIC AND GENERAL OPERATING RULES SPECIAL AIR TRAFFIC RULES High Density Traffic Airports... may operate an aircraft to or from an airport designated as a high density traffic airport unless he...

14 CFR 93.125 - Arrival or departure reservation.

Code of Federal Regulations, 2012 CFR

2012-01-01

... (CONTINUED) AIR TRAFFIC AND GENERAL OPERATING RULES SPECIAL AIR TRAFFIC RULES High Density Traffic Airports... may operate an aircraft to or from an airport designated as a high density traffic airport unless he...

14 CFR 93.125 - Arrival or departure reservation.

Code of Federal Regulations, 2013 CFR

2013-01-01

... (CONTINUED) AIR TRAFFIC AND GENERAL OPERATING RULES SPECIAL AIR TRAFFIC RULES High Density Traffic Airports... may operate an aircraft to or from an airport designated as a high density traffic airport unless he...

75 FR 77674 - Sunshine Act Meeting Notice

Federal Register 2010, 2011, 2012, 2013, 2014

2010-12-13

... Designation. 4. Proposed Rule--Part 740 of NCUA's Rules and Regulations, Accuracy of Advertising and Notice of...-bearing Transaction Accounts. 6. Tri-State Federal Credit Union's Appeal of Region II's Denial of its...