Overlay metrology for double patterning processes
NASA Astrophysics Data System (ADS)
Leray, Philippe; Cheng, Shaunee; Laidler, David; Kandel, Daniel; Adel, Mike; Dinu, Berta; Polli, Marco; Vasconi, Mauro; Salski, Bartlomiej
2009-03-01
The double patterning (DPT) process is foreseen by the industry to be the main solution for the 32 nm technology node and even beyond. Meanwhile process compatibility has to be maintained and the performance of overlay metrology has to improve. To achieve this for Image Based Overlay (IBO), usually the optics of overlay tools are improved. It was also demonstrated that these requirements are achievable with a Diffraction Based Overlay (DBO) technique named SCOLTM [1]. In addition, we believe that overlay measurements with respect to a reference grid are required to achieve the required overlay control [2]. This induces at least a three-fold increase in the number of measurements (2 for double patterned layers to the reference grid and 1 between the double patterned layers). The requirements of process compatibility, enhanced performance and large number of measurements make the choice of overlay metrology for DPT very challenging. In this work we use different flavors of the standard overlay metrology technique (IBO) as well as the new technique (SCOL) to address these three requirements. The compatibility of the corresponding overlay targets with double patterning processes (Litho-Etch-Litho-Etch (LELE); Litho-Freeze-Litho-Etch (LFLE), Spacer defined) is tested. The process impact on different target types is discussed (CD bias LELE, Contrast for LFLE). We compare the standard imaging overlay metrology with non-standard imaging techniques dedicated to double patterning processes (multilayer imaging targets allowing one overlay target instead of three, very small imaging targets). In addition to standard designs already discussed [1], we investigate SCOL target designs specific to double patterning processes. The feedback to the scanner is determined using the different techniques. The final overlay results obtained are compared accordingly. We conclude with the pros and cons of each technique and suggest the optimal metrology strategy for overlay control in double patterning processes.
Diffraction-based overlay for spacer patterning and double patterning technology
NASA Astrophysics Data System (ADS)
Lee, Byoung Hoon; Park, JeongSu; Lee, Jongsu; Park, Sarohan; Lim, ChangMoon; Yim, Dong-Gyu; Park, Sungki; Ryu, Chan-Ho; Morgan, Stephen; van de Schaar, Maurits; Fuchs, Andreas; Bhattacharyya, Kaustuve
2011-03-01
Overlay performance will be increasingly important for Spacer Patterning Technology (SPT) and Double Patterning Technology (DPT) as various Resolution Enhancement Techniques are employed to extend the resolution limits of lithography. Continuous shrinkage of devices makes overlay accuracy one of the most critical issues while overlay performance is completely dependent on exposure tool. Image Based Overlay (IBO) has been used as the mainstream metrology for overlay by the main memory IC companies, but IBO is not suitable for some critical layers due to the poor Tool Induced Shift (TIS) values. Hence new overlay metrology is required to improve the overlay measurement accuracy. Diffraction Based Overlay (DBO) is regarded to be an alternative metrology to IBO for more accurate measurements and reduction of reading errors. Good overlay performances of DBO have been reported in many articles. However applying DBO for SPT and DPT layers poses extra challenges for target design. New vernier designs are considered for different DPT and SPT schemes to meet overlay target in DBO system. In this paper, we optimize the design of the DBO target and the performance of DBO to meet the overlay specification of sub-3x nm devices which are using SPT and DPT processes. We show that the appropriate vernier design yields excellent overlay performance in residual and TIS. The paper also demonstrated the effects of vernier structure on overlay accuracy from SEM analysis.
Hybrid overlay metrology for high order correction by using CDSEM
NASA Astrophysics Data System (ADS)
Leray, Philippe; Halder, Sandip; Lorusso, Gian; Baudemprez, Bart; Inoue, Osamu; Okagawa, Yutaka
2016-03-01
Overlay control has become one of the most critical issues for semiconductor manufacturing. Advanced lithographic scanners use high-order corrections or correction per exposure to reduce the residual overlay. It is not enough in traditional feedback of overlay measurement by using ADI wafer because overlay error depends on other process (etching process and film stress, etc.). It needs high accuracy overlay measurement by using AEI wafer. WIS (Wafer Induced Shift) is the main issue for optical overlay, IBO (Image Based Overlay) and DBO (Diffraction Based Overlay). We design dedicated SEM overlay targets for dual damascene process of N10 by i-ArF multi-patterning. The pattern is same as device-pattern locally. Optical overlay tools select segmented pattern to reduce the WIS. However segmentation has limit, especially the via-pattern, for keeping the sensitivity and accuracy. We evaluate difference between the viapattern and relaxed pitch gratings which are similar to optical overlay target at AEI. CDSEM can estimate asymmetry property of target from image of pattern edge. CDSEM can estimate asymmetry property of target from image of pattern edge. We will compare full map of SEM overlay to full map of optical overlay for high order correction ( correctables and residual fingerprints).
NASA Astrophysics Data System (ADS)
Mileham, Jeffrey; Tanaka, Yasushi; Anberg, Doug; Owen, David M.; Lee, Byoung-Ho; Bouche, Eric
2016-03-01
Within the semiconductor lithographic process, alignment control is one of the most critical considerations. In order to realize high device performance, semiconductor technology is approaching the 10 nm design rule, which requires progressively smaller overlay budgets. Simultaneously, structures are expanding in the 3rd dimension, thereby increasing the potential for inter-layer distortion. For these reasons, device patterning is becoming increasingly difficult as the portion of the overlay budget attributed to process-induced variation increases. After lithography, overlay gives valuable feedback to the lithography tool; however overlay measurements typically have limited density, especially at the wafer edge, due to throughput considerations. Moreover, since overlay is measured after lithography, it can only react to, but not predict the process-induced overlay. This study is a joint investigation in a high-volume manufacturing environment of the portion of overlay associated with displacement induced by a single process across many chambers. Displacement measurements are measured by Coherent Gradient Sensing (CGS) interferometry, which generates high-density displacement maps (>3 million points on a 300 mm wafer) such that the stresses induced die-by-die and process-by-process can be tracked in detail. The results indicate the relationship between displacement and overlay shows the ability to forecast overlay values before the lithographic process. Details of the correlation including overlay/displacement range, and lot-to-lot displacement variability are considered.
NASA Astrophysics Data System (ADS)
Chen, Kai-Hsiung; Huang, Guo-Tsai; Hsieh, Hung-Chih; Ni, Wei-Feng; Chuang, S. M.; Chuang, T. K.; Ke, Chih-Ming; Huang, Jacky; Rao, Shiuan-An; Cumurcu Gysen, Aysegul; d'Alfonso, Maxime; Yueh, Jenny; Izikson, Pavel; Soco, Aileen; Wu, Jon; Nooitgedagt, Tjitte; Ottens, Jeroen; Kim, Yong Ho; Ebert, Martin
2017-03-01
On-product overlay requirements are becoming more challenging with every next technology node due to the continued decrease of the device dimensions and process tolerances. Therefore, current and future technology nodes require demanding metrology capabilities such as target designs that are robust towards process variations and high overlay measurement density (e.g. for higher order process corrections) to enable advanced process control solutions. The impact of advanced control solutions based on YieldStar overlay data is being presented in this paper. Multi patterning techniques are applied for critical layers and leading to additional overlay measurement demands. The use of 1D process steps results in the need of overlay measurements relative to more than one layer. Dealing with the increased number of overlay measurements while keeping the high measurement density and metrology accuracy at the same time presents a challenge for high volume manufacturing (HVM). These challenges are addressed by the capability to measure multi-layer targets with the recently introduced YieldStar metrology tool, YS350. On-product overlay results of such multi-layers and standard targets are presented including measurement stability performance.
NASA Astrophysics Data System (ADS)
Sturtevant, John L.; Liubich, Vlad; Gupta, Rachit
2016-04-01
Edge placement error (EPE) was a term initially introduced to describe the difference between predicted pattern contour edge and the design target for a single design layer. Strictly speaking, this quantity is not directly measurable in the fab. What is of vital importance is the relative edge placement errors between different design layers, and in the era of multipatterning, the different constituent mask sublayers for a single design layer. The critical dimensions (CD) and overlay between two layers can be measured in the fab, and there has always been a strong emphasis on control of overlay between design layers. The progress in this realm has been remarkable, accelerated in part at least by the proliferation of multipatterning, which reduces the available overlay budget by introducing a coupling of overlay and CD errors for the target layer. Computational lithography makes possible the full-chip assessment of two-layer edge to edge distances and two-layer contact overlap area. We will investigate examples of via-metal model-based analysis of CD and overlay errors. We will investigate both single patterning and double patterning. For single patterning, we show the advantage of contour-to-contour simulation over contour to target simulation, and how the addition of aberrations in the optical models can provide a more realistic CD-overlay process window (PW) for edge placement errors. For double patterning, the interaction of 4-layer CD and overlay errors is very complex, but we illustrate that not only can full-chip verification identify potential two-layer hotspots, the optical proximity correction engine can act to mitigate such hotspots and enlarge the joint CD-overlay PW.
Hybrid overlay metrology with CDSEM in a BEOL patterning scheme
NASA Astrophysics Data System (ADS)
Leray, Philippe; Jehoul, Christiane; Inoue, Osamu; Okagawa, Yutaka
2015-03-01
Overlay metrology accuracy is a major concern for our industry. Advanced logic process require more tighter overlay control for multipatterning schemes. TIS (Tool Induced Shift) and WIS (Wafer Induced Shift) are the main issues for IBO (Image Based Overlay) and DBO (Diffraction Based Overlay). Methods of compensation have been introduced, some are even very efficient to reduce these measured offsets. Another related question is about the overlay target designs. These targets are never fully representative of the design rules, strong efforts have been achieved, but the device cannot be completely duplicated. Ideally, we would like to measure in the device itself to verify the real overlay value. Top down CDSEM can measure critical dimensions of any structure, it is not dependent of specific target design. It can also measure the overlay errors but only in specific cases like LELE (Litho Etch Litho Etch) after final patterning. In this paper, we will revisit the capability of the CDSEM at final patterning by measuring overlay in dedicated targets as well as inside a logic and an SRAM design. In the dedicated overlay targets, we study the measurement differences between design rules gratings and relaxed pitch gratings. These relaxed pitch which are usually used in IBO or DBO targets. Beyond this "simple" LELE case, we will explore the capability of the CDSEM to measure overlay even if not at final patterning, at litho level. We will assess the hybridization of DBO and CDSEM for reference to optical tools after final patterning. We will show that these reference data can be used to validate the DBO overlay results (correctables and residual fingerprints).
Diffraction based overlay and image based overlay on production flow for advanced technology node
NASA Astrophysics Data System (ADS)
Blancquaert, Yoann; Dezauzier, Christophe
2013-04-01
One of the main challenges for lithography step is the overlay control. For the advanced technology node like 28nm and 14nm, the overlay budget becomes very tight. Two overlay techniques compete in our advanced semiconductor manufacturing: the Diffraction based Overlay (DBO) with the YieldStar S200 (ASML) and the Image Based Overlay (IBO) with ARCHER (KLA). In this paper we will compare these two methods through 3 critical production layers: Poly Gate, Contact and first metal layer. We will show the overlay results of the 2 techniques, explore the accuracy and compare the total measurement uncertainty (TMU) for the standard overlay targets of both techniques. We will see also the response and impact for the Image Based Overlay and Diffraction Based Overlay techniques through a process change like an additional Hardmask TEOS layer on the front-end stack. The importance of the target design is approached; we will propose more adapted design for image based targets. Finally we will present embedded targets in the 14 FDSOI with first results.
Diffraction-based overlay metrology for double patterning technologies
NASA Astrophysics Data System (ADS)
Dasari, Prasad; Korlahalli, Rahul; Li, Jie; Smith, Nigel; Kritsun, Oleg; Volkman, Cathy
2009-03-01
The extension of optical lithography to 32nm and beyond is made possible by Double Patterning Techniques (DPT) at critical levels of the process flow. The ease of DPT implementation is hindered by increased significance of critical dimension uniformity and overlay errors. Diffraction-based overlay (DBO) has shown to be an effective metrology solution for accurate determination of the overlay errors associated with double patterning [1, 2] processes. In this paper we will report its use in litho-freeze-litho-etch (LFLE) and spacer double patterning technology (SDPT), which are pitch splitting solutions that reduce the significance of overlay errors. Since the control of overlay between various mask/level combinations is critical for fabrication, precise and accurate assessment of errors by advanced metrology techniques such as spectroscopic diffraction based overlay (DBO) and traditional image-based overlay (IBO) using advanced target designs will be reported. A comparison between DBO, IBO and CD-SEM measurements will be reported. . A discussion of TMU requirements for 32nm technology and TMU performance data of LFLE and SDPT targets by different overlay approaches will be presented.
Solar selective absorption coatings
Mahoney, Alan R [Albuquerque, NM; Reed, Scott T [Albuquerque, NM; Ashley, Carol S [Albuquerque, NM; Martinez, F Edward [Horseheads, NY
2004-08-31
A new class of solar selective absorption coatings are disclosed. These coatings comprise a structured metallic overlayer such that the overlayer has a sub-micron structure designed to efficiently absorb solar radiation, while retaining low thermal emissivity for infrared thermal radiation. A sol-gel layer protects the structured metallic overlayer from mechanical, thermal, and environmental degradation. Processes for producing such solar selective absorption coatings are also disclosed.
Solar selective absorption coatings
Mahoney, Alan R [Albuquerque, NM; Reed, Scott T [Albuquerque, NM; Ashley, Carol S [Albuquerque, NM; Martinez, F Edward [Horseheads, NY
2003-10-14
A new class of solar selective absorption coatings are disclosed. These coatings comprise a structured metallic overlayer such that the overlayer has a sub-micron structure designed to efficiently absorb solar radiation, while retaining low thermal emissivity for infrared thermal radiation. A sol-gel layer protects the structured metallic overlayer from mechanical, thermal, and environmental degradation. Processes for producing such solar selective absorption coatings are also disclosed.
Scatterometry or imaging overlay: a comparative study
NASA Astrophysics Data System (ADS)
Hsu, Simon C. C.; Pai, Yuan Chi; Chen, Charlie; Yu, Chun Chi; Hsing, Henry; Wu, Hsing-Chien; Kuo, Kelly T. L.; Amir, Nuriel
2015-03-01
Most fabrication facilities today use imaging overlay measurement methods, as it has been the industry's reliable workhorse for decades. In the last few years, third-generation Scatterometry Overlay (SCOL™) or Diffraction Based Overlay (DBO-1) technology was developed, along another DBO technology (DBO-2). This development led to the question of where the DBO technology should be implemented for overlay measurements. Scatterometry has been adopted for high volume production in only few cases, always with imaging as a backup, but scatterometry overlay is considered by many as the technology of the future. In this paper we compare imaging overlay and DBO technologies by means of measurements and simulations. We outline issues and sensitivities for both technologies, providing guidelines for the best implementation of each. For several of the presented cases, data from two different DBO technologies are compared as well, the first with Pupil data access (DBO-1) and the other without pupil data access (DBO-2). Key indicators of overlay measurement quality include: layer coverage, accuracy, TMU, process robustness and robustness to process changes. Measurement data from real cases across the industry are compared and the conclusions are also backed by simulations. Accuracy is benchmarked with reference OVL, and self-consistency, showing good results for Imaging and DBO-1 technology. Process sensitivity and metrology robustness are mostly simulated with MTD (Metrology Target Designer) comparing the same process variations for both technologies. The experimental data presented in this study was done on ten advanced node layers and three production node layers, for all phases of the IC fabrication process (FEOL, MEOL and BEOL). The metrology tool used for most of the study is KLA-Tencor's Archer 500LCM system (scatterometry-based and imaging-based measurement technologies on the same tool) another type of tool is used for DBO-2 measurements. Finally, we conclude that both imaging overlay technology and DBO-1 technology are fully successful and have a valid roadmap for the next few design nodes, with some use cases better suited for one or the other measurement technologies. Having both imaging and DBO technology options available in parallel, allows Overlay Engineers a mix and match overlay measurement strategy, providing back up when encountering difficulties with one of the technologies and benefiting from the best of both technologies for every use case.
Achieving optimum diffraction based overlay performance
NASA Astrophysics Data System (ADS)
Leray, Philippe; Laidler, David; Cheng, Shaunee; Coogans, Martyn; Fuchs, Andreas; Ponomarenko, Mariya; van der Schaar, Maurits; Vanoppen, Peter
2010-03-01
Diffraction Based Overlay (DBO) metrology has been shown to have significantly reduced Total Measurement Uncertainty (TMU) compared to Image Based Overlay (IBO), primarily due to having no measurable Tool Induced Shift (TIS). However, the advantages of having no measurable TIS can be outweighed by increased susceptibility to WIS (Wafer Induced Shift) caused by target damage, process non-uniformities and variations. The path to optimum DBO performance lies in having well characterized metrology targets, which are insensitive to process non-uniformities and variations, in combination with optimized recipes which take advantage of advanced DBO designs. In this work we examine the impact of different degrees of process non-uniformity and target damage on DBO measurement gratings and study their impact on overlay measurement accuracy and precision. Multiple wavelength and dual polarization scatterometry are used to characterize the DBO design performance over the range of process variation. In conclusion, we describe the robustness of DBO metrology to target damage and show how to exploit the measurement capability of a multiple wavelength, dual polarization scatterometry tool to ensure the required measurement accuracy for current and future technology nodes.
The performances of different overlay mark types at 65nm node on 300-mm wafers
NASA Astrophysics Data System (ADS)
Tseng, H. T.; Lin, Ling-Chieh; Huang, I. H.; Lin, Benjamin S.; Huang, Chin-Chou K.; Huang, Chien-Jen
2005-05-01
The integrated circuit (IC) manufacturing factories have measured overlay with conventional "box-in-box" (BiB) or "frame-in-frame" (FiF) structures for many years. Since UMC played as a roll of world class IC foundry service provider, tighter and tighter alignment accuracy specs need to be achieved from generation to generation to meet any kind of customers' requirement, especially according to International Technology Roadmap for Semiconductors (ITRS) 2003 METROLOGY section1. The process noises resulting from dishing, overlay mark damaging by chemical mechanism polishing (CMP), and the variation of film thickness during deposition are factors which can be very problematic in mark alignment. For example, the conventional "box-in-box" overlay marks could be damaged easily by CMP, because the less local pattern density and wide feature width of the box induce either dishing or asymmetric damages for the measurement targets, which will make the overlay measurement varied and difficult. After Advanced Imaging Metrology (AIM) overlay targets was introduced by KLA-Tencor, studies in the past shown AIM was more robust in overlay metrology than conventional FiF or BiB targets. In this study, the applications of AIM overlay marks under different process conditions will be discussed and compared with the conventional overlay targets. To evaluate the overlay mark performance against process variation on 65nm technology node in 300-mm wafer, three critical layers were chosen in this study. These three layers were Poly, Contact, and Cu-Metal. The overlay targets used for performance comparison were BiB and Non-Segmented AIM (NS AIM) marks. We compared the overlay mark performance on two main areas. The first one was total measurement uncertainty (TMU)3 related items that include Tool Induced Shift (TIS) variability, precision, and matching. The other area is the target robustness against process variations. Based on the present study AIM mark demonstrated an equal or better performance in the TMU related items under our process conditions. However, when non-optimized tungsten CMP was introduced in the tungsten contact process, due to the dense grating line structure design, we found that AIM mark was much more robust than BiB overlay target.
NASA Astrophysics Data System (ADS)
Ducoté, Julien; Dettoni, Florent; Bouyssou, Régis; Le-Gratiet, Bertrand; Carau, Damien; Dezauzier, Christophe
2015-03-01
Patterning process control of advanced nodes has required major changes over the last few years. Process control needs of critical patterning levels since 28nm technology node is extremely aggressive showing that metrology accuracy/sensitivity must be finely tuned. The introduction of pitch splitting (Litho-Etch-Litho-Etch) at 14FDSOInm node requires the development of specific metrologies to adopt advanced process control (for CD, overlay and focus corrections). The pitch splitting process leads to final line CD uniformities that are a combination of the CD uniformities of the two exposures, while the space CD uniformities are depending on both CD and OVL variability. In this paper, investigations of CD and OVL process control of 64nm minimum pitch at Metal1 level of 14FDSOI technology, within the double patterning process flow (Litho, hard mask etch, line etch) are presented. Various measurements with SEMCD tools (Hitachi), and overlay tools (KT for Image Based Overlay - IBO, and ASML for Diffraction Based Overlay - DBO) are compared. Metrology targets are embedded within a block instanced several times within the field to perform intra-field process variations characterizations. Specific SEMCD targets were designed for independent measurement of both line CD (A and B) and space CD (A to B and B to A) for each exposure within a single measurement during the DP flow. Based on those measurements correlation between overlay determined with SEMCD and with standard overlay tools can be evaluated. Such correlation at different steps through the DP flow is investigated regarding the metrology type. Process correction models are evaluated with respect to the measurement type and the intra-field sampling.
Reducing the overlay metrology sensitivity to perturbations of the measurement stack
NASA Astrophysics Data System (ADS)
Zhou, Yue; Park, DeNeil; Gutjahr, Karsten; Gottipati, Abhishek; Vuong, Tam; Bae, Sung Yong; Stokes, Nicholas; Jiang, Aiqin; Hsu, Po Ya; O'Mahony, Mark; Donini, Andrea; Visser, Bart; de Ruiter, Chris; Grzela, Grzegorz; van der Laan, Hans; Jak, Martin; Izikson, Pavel; Morgan, Stephen
2017-03-01
Overlay metrology setup today faces a continuously changing landscape of process steps. During Diffraction Based Overlay (DBO) metrology setup, many different metrology target designs are evaluated in order to cover the full process window. The standard method for overlay metrology setup consists of single-wafer optimization in which the performance of all available metrology targets is evaluated. Without the availability of external reference data or multiwafer measurements it is hard to predict the metrology accuracy and robustness against process variations which naturally occur from wafer-to-wafer and lot-to-lot. In this paper, the capabilities of the Holistic Metrology Qualification (HMQ) setup flow are outlined, in particular with respect to overlay metrology accuracy and process robustness. The significance of robustness and its impact on overlay measurements is discussed using multiple examples. Measurement differences caused by slight stack variations across the target area, called grating imbalance, are shown to cause significant errors in the overlay calculation in case the recipe and target have not been selected properly. To this point, an overlay sensitivity check on perturbations of the measurement stack is presented for improvement of the overlay metrology setup flow. An extensive analysis on Key Performance Indicators (KPIs) from HMQ recipe optimization is performed on µDBO measurements of product wafers. The key parameters describing the sensitivity to perturbations of the measurement stack are based on an intra-target analysis. Using advanced image analysis, which is only possible for image plane detection of μDBO instead of pupil plane detection of DBO, the process robustness performance of a recipe can be determined. Intra-target analysis can be applied for a wide range of applications, independent of layers and devices.
Diffraction based overlay metrology for α-carbon applications
NASA Astrophysics Data System (ADS)
Saravanan, Chandra Saru; Tan, Asher; Dasari, Prasad; Goelzer, Gary; Smith, Nigel; Woo, Seouk-Hoon; Shin, Jang Ho; Kang, Hyun Jae; Kim, Ho Chul
2008-03-01
Applications that require overlay measurement between layers separated by absorbing interlayer films (such as α- carbon) pose significant challenges for sub-50nm processes. In this paper scatterometry methods are investigated as an alternative to meet these stringent overlay metrology requirements. In this article, a spectroscopic Diffraction Based Overlay (DBO) measurement technique is used where registration errors are extracted from specially designed diffraction targets. DBO measurements are performed on detailed set of wafers with varying α-carbon (ACL) thicknesses. The correlation in overlay values between wafers with varying ACL thicknesses will be discussed. The total measurement uncertainty (TMU) requirements for these layers are discussed and the DBO TMU results from sub-50nm samples are reviewed.
A comparison of advanced overlay technologies
NASA Astrophysics Data System (ADS)
Dasari, Prasad; Smith, Nigel; Goelzer, Gary; Liu, Zhuan; Li, Jie; Tan, Asher; Koh, Chin Hwee
2010-03-01
The extension of optical lithography to 22nm and beyond by Double Patterning Technology is often challenged by CDU and overlay control. With reduced overlay measurement error budgets in the sub-nm range, relying on traditional Total Measurement Uncertainty (TMU) estimates alone is no longer sufficient. In this paper we will report scatterometry overlay measurements data from a set of twelve test wafers, using four different target designs. The TMU of these measurements is under 0.4nm, within the process control requirements for the 22nm node. Comparing the measurement differences between DBO targets (using empirical and model based analysis) and with image-based overlay data indicates the presence of systematic and random measurement errors that exceeds the TMU estimate.
Implementation of Texas asphalt concrete overlay design system.
DOT National Transportation Integrated Search
2014-08-01
An asphalt overlay design system was developed for Texas Department of Transportation (TxDOT) under : Research Project 0-5123. The new overlay design system, named the Texas Asphalt Concrete Overlay : Design System (TxACOL), can help pavement enginee...
Optical DC overlay measurement in the 2nd level process of 65 nm alternating phase shift mask
NASA Astrophysics Data System (ADS)
Ma, Jian; Han, Ke; Lee, Kyung; Korobko, Yulia; Silva, Mary; Chavez, Joas; Irvine, Brian; Henrichs, Sven; Chakravorty, Kishore; Olshausen, Robert; Chandramouli, Mahesh; Mammen, Bobby; Padmanaban, Ramaswamy
2005-11-01
Alternating phase shift mask (APSM) techniques help bridge the significant gap between the lithography wavelength and the patterning of minimum features, specifically, the poly line of 35 nm gate length (1x) in Intel's 65 nm technology. One of key steps in making APSM mask is to pattern to within the design tolerances the 2nd level resist so that the zero-phase apertures will be protected by the resist and the pi-phase apertures will be wide open for quartz etch. The ability to align the 2nd level to the 1st level binary pattern, i.e. the 2nd level overlay capability is very important, so is the capability of measuring the overlay accurately. Poor overlay could cause so-called the encroachment after quartz etch, producing undesired quartz bumps in the pi-apertures or quartz pits in the zero-apertures. In this paper, a simple, low-cost optical setup for the 2nd level DC (develop check) overlay measurements in the high volume manufacturing (HVM) of APSM masks is presented. By removing systematic errors in overlay associated with TIS and MIS (tool-induced shift and Mask-process induced shift), it is shown that this setup is capable of supporting the measurement of DC overlay with a tolerance as small as +/- 25 nm. The outstanding issues, such as DC overlay error component analysis, DC - FC (final check) overlay correlation and the overlay linearity (periphery vs. indie), are discussed.
The effect of individually-induced processes on image-based overlay and diffraction-based overlay
NASA Astrophysics Data System (ADS)
Oh, SeungHwa; Lee, Jeongjin; Lee, Seungyoon; Hwang, Chan; Choi, Gilheyun; Kang, Ho-Kyu; Jung, EunSeung
2014-04-01
In this paper, set of wafers with separated processes was prepared and overlay measurement result was compared in two methods; IBO and DBO. Based on the experimental result, theoretical approach of relationship between overlay mark deformation and overlay variation is presented. Moreover, overlay reading simulation was used in verification and prediction of overlay variation due to deformation of overlay mark caused by induced processes. Through this study, understanding of individual process effects on overlay measurement error is given. Additionally, guideline of selecting proper overlay measurement scheme for specific layer is presented.
A basic guide to overlay design using nondestructive testing equipment data
NASA Astrophysics Data System (ADS)
Turner, Vernon R.
1990-08-01
The purpose of this paper is to provide a basic and concise guide to designing asphalt concrete (AC) overlays over existing AC pavements. The basis for these designs is deflection data obtained from nondestructive testing (NDT) equipment. This data is used in design procedures which produce required overlay thickness or an estimate of remaining pavement life. This guide enables one to design overlays or better monitor the designs being performed by others. This paper will discuss three types of NDT equipment, the Asphalt Institute Overlay Designs by Deflection Analysis and by the effective thickness method as well as a method of estimating remaining pavement life, correlations between NDT equipment and recent correlations in Washington State. Asphalt overlays provide one of the most cost effective methods of improving existing pavements. Asphalt overlays can be used to strengthen existing pavements, to reduce maintenance costs, to increase pavement life, to provide a smoother ride, and to improve skid resistance.
Development of an Overlay Design Procedure for Composite Pavements
DOT National Transportation Integrated Search
2017-09-01
The composite overlay design procedure currently used by ODOT sometimes produces very large overlay thicknesses that are deemed structurally unnecessary, especially for composite pavements already with thick asphalt overlays. This study was initiated...
Mechanistic flexible pavement overlay design program : tech summary.
DOT National Transportation Integrated Search
2009-07-01
The Louisiana Department of Transportation and Development (LADOTD) currently follows the 1993 : AASHTO pavement design guides component analysis method in its fl exible pavement overlay thickness : design. Such an overlay design method, how...
Spectral evolution with incremental nanocoating of long period fiber gratings
NASA Astrophysics Data System (ADS)
Del Villar, Ignacio; Corres, Jesus M.; Achaerandio, Miguel; Arregui, Francisco J.; Matias, Ignacio R.
2006-12-01
The incremental deposition of a thin overlay on the cladding of a long-period fiber grating (LPFG) induces important resonance wavelength shifts in the transmission spectrum. The phenomenon is proved theoretically with a vectorial method based on hybrid modes and coupled mode theory, and experimentally with electrostatic self-assembly monolayer process. The phenomenon is repeated periodically for specific overlay thickness values with the particularity that the shape of the resonance wavelength shift depends on the thickness of the overlay. The main applications are the design of wide optical filters and multiparameter sensing devices.
NASA Astrophysics Data System (ADS)
Yahiro, Takehisa; Sawamura, Junpei; Dosho, Tomonori; Shiba, Yuji; Ando, Satoshi; Ishikawa, Jun; Morita, Masahiro; Shibazaki, Yuichi
2018-03-01
One of the main components of an On-Product Overlay (OPO) error budget is the process induced wafer error. This necessitates wafer-to-wafer correction in order to optimize overlay accuracy. This paper introduces the Litho Booster (LB), standalone alignment station as a solution to improving OPO. LB can execute high speed alignment measurements without throughput (THP) loss. LB can be installed in any lithography process control loop as a metrology tool, and is then able to provide feed-forward (FF) corrections to the scanners. In this paper, the detailed LB design is described and basic LB performance and OPO improvement is demonstrated. Litho Booster's extendibility and applicability as a solution for next generation manufacturing accuracy and productivity challenges are also outlined
Faster diffraction-based overlay measurements with smaller targets using 3D gratings
NASA Astrophysics Data System (ADS)
Li, Jie; Kritsun, Oleg; Liu, Yongdong; Dasari, Prasad; Volkman, Catherine; Hu, Jiangtao
2012-03-01
Diffraction-based overlay (DBO) technologies have been developed to address the overlay metrology challenges for 22nm technology node and beyond. Most DBO technologies require specially designed targets that consist of multiple measurement pads, which consume too much space and increase measurement time. The traditional empirical approach (eDBO) using normal incidence spectroscopic reflectometry (NISR) relies on linear response of the reflectance with respect to overlay displacement within a small range. It offers convenience of quick recipe setup since there is no need to establish a model. However it requires three or four pads per direction (x or y) which adds burden to throughput and target size. Recent advances in modeling capability and computation power enabled mDBO, which allows overlay measurement with reduced number of pads, thus reducing measurement time and DBO target space. In this paper we evaluate the performance of single pad mDBO measurements using two 3D targets that have different grating shapes: squares in boxes and L-shapes in boxes. Good overlay sensitivities are observed for both targets. The correlation to programmed shifts and image-based overlay (IBO) is excellent. Despite the difference in shapes, the mDBO results are comparable for square and L-shape targets. The impact of process variations on overlay measurements is studied using a focus and exposure matrix (FEM) wafer. Although the FEM wafer has larger process variations, the correlation of mDBO results with IBO measurements is as good as the normal process wafer. We demonstrate the feasibility of single pad DBO measurements with faster throughput and smaller target size, which is particularly important in high volume manufacturing environment.
NASA Astrophysics Data System (ADS)
Smith, R. E.; Lytton, R. L.
1984-04-01
A ready reference for highway engineers who are interested in purchasing nondestructive testing (NDT) equipment for use in designing overlays for flexible pavements was prepared. All commercially available equipment is described. Information includes basic descriptions plus current prices quoted by the manufacturers/distributors. To determine user comments, a questionnaire was sent to nine State agencies, and one Federal agency. The responses to these questionnaires are summarized. Overlay thickness design procedures for flexible pavements are reviewed. Important components related to the use of NDT deflection measuremnts in overlay design are identified and addressed. Summary tables of equipment characteristics and overlay design procedures are presented.
Overlay Tolerances For VLSI Using Wafer Steppers
NASA Astrophysics Data System (ADS)
Levinson, Harry J.; Rice, Rory
1988-01-01
In order for VLSI circuits to function properly, the masking layers used in the fabrication of those devices must overlay each other to within the manufacturing tolerance incorporated in the circuit design. The capabilities of the alignment tools used in the masking process determine the overlay tolerances to which circuits can be designed. It is therefore of considerable importance that these capabilities be well characterized. Underestimation of the overlay accuracy results in unnecessarily large devices, resulting in poor utilization of wafer area and possible degradation of device performance. Overestimation will result in significant yield loss because of the failure to conform to the tolerances of the design rules. The proper methodology for determining the overlay capabilities of wafer steppers, the most commonly used alignment tool for the production of VLSI circuits, is the subject of this paper. Because cost-effective manufacturing process technology has been the driving force of VLSI, the impact on productivity is a primary consideration in all discussions. Manufacturers of alignment tools advertise the capabilities of their equipment. It is notable that no manufacturer currently characterizes his aligners in a manner consistent with the requirements of producing very large integrated circuits, as will be discussed. This has resulted in the situation in which the evaluation and comparison of the capabilities of alignment tools require the attention of a lithography specialist. Unfortunately, lithographic capabilities must be known by many other people, particularly the circuit designers and the managers responsible for the financial consequences of the high prices of modern alignment tools. All too frequently, the designer or manager is confronted with contradictory data, one set coming from his lithography specialist, and the other coming from a sales representative of an equipment manufacturer. Since the latter generally attempts to make his merchandise appear as attractive as possible, the lithographer is frequently placed in the position of having to explain subtle issues in order to justify his decisions. It is the purpose of this paper to provide that explanation.
Advanced overlay analysis through design based metrology
NASA Astrophysics Data System (ADS)
Ji, Sunkeun; Yoo, Gyun; Jo, Gyoyeon; Kang, Hyunwoo; Park, Minwoo; Kim, Jungchan; Park, Chanha; Yang, Hyunjo; Yim, Donggyu; Maruyama, Kotaro; Park, Byungjun; Yamamoto, Masahiro
2015-03-01
As design rule shrink, overlay has been critical factor for semiconductor manufacturing. However, the overlay error which is determined by a conventional measurement with an overlay mark based on IBO and DBO often does not represent the physical placement error in the cell area. The mismatch may arise from the size or pitch difference between the overlay mark and the cell pattern. Pattern distortion caused by etching or CMP also can be a source of the mismatch. In 2014, we have demonstrated that method of overlay measurement in the cell area by using DBM (Design Based Metrology) tool has more accurate overlay value than conventional method by using an overlay mark. We have verified the reproducibility by measuring repeatable patterns in the cell area, and also demonstrated the reliability by comparing with CD-SEM data. We have focused overlay mismatching between overlay mark and cell area until now, further more we have concerned with the cell area having different pattern density and etch loading. There appears a phenomenon which has different overlay values on the cells with diverse patterning environment. In this paper, the overlay error was investigated from cell edge to center. For this experiment, we have verified several critical layers in DRAM by using improved(Better resolution and speed) DBM tool, NGR3520.
NASA Astrophysics Data System (ADS)
Salerno, Antonio; de la Fuente, Isabel; Hsu, Zack; Tai, Alan; Chang, Hammer; McNamara, Elliott; Cramer, Hugo; Li, Daoping
2018-03-01
In next generation Logic devices, overlay control requirements shrink to sub 2.5nm level on-product overlay. Historically on-product overlay has been defined by the overlay capability of after-develop in-scribe targets. However, due to design and dimension, the after development metrology targets are not completely representative for the final overlay of the device. In addition, they are confined to the scribe-lane area, which limits the sampling possibilities. To address these two issues, metrology on structures matching the device structure and which can be sampled with high density across the device is required. Conventional after-etch CDSEM techniques on logic devices present difficulties in discerning the layers of interest, potential destructive charging effects and finally, they are limited by the long measurement times[1] [2] [3] . All together, limit the sampling densities and making CDSEM less attractive for control applications. Optical metrology can overcome most of these limitations. Such measurement, however, does require repetitive structures. This requirement is not fulfilled by logic devices, as the features vary in pitch and CD over the exposure field. The solution is to use small targets, with a maximum pad size of 5x5um2 , which can easily be placed in the logic cell area. These targets share the process and architecture of the device features of interest, but with a modified design that replicates as close as possible the device layout, allowing for in-device metrology for both CD and Overlay. This solution enables measuring closer to the actual product feature location and, not being limited to scribe-lanes, it opens the possibility of higher-density sampling schemes across the field. In summary, these targets become the facilitator of in-device metrology (IDM), that is, enabling the measurements both in-device Overlay and the CD parameters of interest and can deliver accurate, high-throughput, dense and after-etch measurements for Logic. Overlay improvements derived from a high-densely sampled Overlay map measured with 5x5 um2 In Device Metrology (IDM) targets were investigated on a customer Logic application. In this work we present both the main design aspects of the 5x5 um2 IDM targets, as well as the results on the improved Overlay performance.
NASA Astrophysics Data System (ADS)
Blancquaert, Yoann; Dezauzier, Christophe; Depre, Jerome; Miqyass, Mohamed; Beltman, Jan
2013-04-01
Continued tightening of overlay control budget in semiconductor lithography drives the need for improved metrology capabilities. Aggressive improvements are needed for overlay metrology speed, accuracy and precision. This paper is dealing with the on product metrology results of a scatterometry based platform showing excellent production results on resolution, precision, and tool matching for overlay. We will demonstrate point to point matching between tool generations as well as between target sizes and types. Nowadays, for the advanced process nodes a lot of information is needed (Higher order process correction, Reticle fingerprint, wafer edge effects) to quantify process overlay. For that purpose various overlay sampling schemes are evaluated: ultra- dense, dense and production type. We will show DBO results from multiple target type and shape for on product overlay control for current and future node down to at least 14 nm node. As overlay requirements drive metrology needs, we will evaluate if the new metrology platform meets the overlay requirements.
Improving scanner wafer alignment performance by target optimization
NASA Astrophysics Data System (ADS)
Leray, Philippe; Jehoul, Christiane; Socha, Robert; Menchtchikov, Boris; Raghunathan, Sudhar; Kent, Eric; Schoonewelle, Hielke; Tinnemans, Patrick; Tuffy, Paul; Belen, Jun; Wise, Rich
2016-03-01
In the process nodes of 10nm and below, the patterning complexity along with the processing and materials required has resulted in a need to optimize alignment targets in order to achieve the required precision, accuracy and throughput performance. Recent industry publications on the metrology target optimization process have shown a move from the expensive and time consuming empirical methodologies, towards a faster computational approach. ASML's Design for Control (D4C) application, which is currently used to optimize YieldStar diffraction based overlay (DBO) metrology targets, has been extended to support the optimization of scanner wafer alignment targets. This allows the necessary process information and design methodology, used for DBO target designs, to be leveraged for the optimization of alignment targets. In this paper, we show how we applied this computational approach to wafer alignment target design. We verify the correlation between predictions and measurements for the key alignment performance metrics and finally show the potential alignment and overlay performance improvements that an optimized alignment target could achieve.
Device overlay method for high volume manufacturing
NASA Astrophysics Data System (ADS)
Lee, Honggoo; Han, Sangjun; Kim, Youngsik; Kim, Myoungsoo; Heo, Hoyoung; Jeon, Sanghuck; Choi, DongSub; Nabeth, Jeremy; Brinster, Irina; Pierson, Bill; Robinson, John C.
2016-03-01
Advancing technology nodes with smaller process margins require improved photolithography overlay control. Overlay control at develop inspection (DI) based on optical metrology targets is well established in semiconductor manufacturing. Advances in target design and metrology technology have enabled significant improvements in overlay precision and accuracy. One approach to represent in-die on-device as-etched overlay is to measure at final inspection (FI) with a scanning electron microscope (SEM). Disadvantages to this approach include inability to rework, limited layer coverage due to lack of transparency, and higher cost of ownership (CoO). A hybrid approach is investigated in this report whereby infrequent DI/FI bias is characterized and the results are used to compensate the frequent DI overlay results. The bias characterization is done on an infrequent basis, either based on time or triggered from change points. On a per-device and per-layer basis, the optical target overlay at DI is compared with SEM on-device overlay at FI. The bias characterization results are validated and tracked for use in compensating the DI APC controller. Results of the DI/FI bias characterization and sources of variation are presented, as well as the impact on the DI correctables feeding the APC system. Implementation details in a high volume manufacturing (HVM) wafer fab will be reviewed. Finally future directions of the investigation will be discussed.
NASA Astrophysics Data System (ADS)
Majidzadeh, K.; Ilves, G. J.
1981-08-01
A ready reference to design procedures for asphaltic concrete overlay of flexible pavements based on elastic layer theory is provided. The design procedures and the analytical techniques presented were formulated to predict the structural fatigue response of asphaltic concrete overlays for various design conditions, including geometrical and material properties, loading conditions and environmental variables.
NASA Astrophysics Data System (ADS)
Lee, Hong-Goo; Schmitt-Weaver, Emil; Kim, Min-Suk; Han, Sang-Jun; Kim, Myoung-Soo; Kwon, Won-Taik; Park, Sung-Ki; Ryan, Kevin; Theeuwes, Thomas; Sun, Kyu-Tae; Lim, Young-Wan; Slotboom, Daan; Kubis, Michael; Staecker, Jens
2015-03-01
While semiconductor manufacturing moves toward the 7nm node for logic and 15nm node for memory, an increased emphasis has been placed on reducing the influence known contributors have toward the on product overlay budget. With a machine learning technique known as function approximation, we use a neural network to gain insight to how known contributors, such as those collected with scanner metrology, influence the on product overlay budget. The result is a sufficiently trained function that can approximate overlay for all wafers exposed with the lithography system. As a real world application, inline metrology can be used to measure overlay for a few wafers while using the trained function to approximate overlay vector maps for the entire lot of wafers. With the approximated overlay vector maps for all wafers coming off the track, a process engineer can redirect wafers or lots with overlay signatures outside the standard population to offline metrology for excursion validation. With this added flexibility, engineers will be given more opportunities to catch wafers that need to be reworked, resulting in improved yield. The quality of the derived corrections from measured overlay metrology feedback can be improved using the approximated overlay to trigger, which wafers should or shouldn't be, measured inline. As a development or integration engineer the approximated overlay can be used to gain insight into lots and wafers used for design of experiments (DOE) troubleshooting. In this paper we will present the results of a case study that follows the machine learning function approximation approach to data analysis, with production overlay measured on an inline metrology system at SK hynix.
Verification of the ODOT overlay design procedure : final report, June 1996.
DOT National Transportation Integrated Search
1996-06-01
The current ODOT overlay design procedure sometimes indicates additional pavement thickness is needed right after the overlay construction. Evaluation of the current procedure reveals that using spreadabiity to back calculate existing pavement modulu...
Enhacement of intrafield overlay using a design based metrology system
NASA Astrophysics Data System (ADS)
Jo, Gyoyeon; Ji, Sunkeun; Kim, Shinyoung; Kang, Hyunwoo; Park, Minwoo; Kim, Sangwoo; Kim, Jungchan; Park, Chanha; Yang, Hyunjo; Maruyama, Kotaro; Park, Byungjun
2016-03-01
As the scales of the semiconductor devices continue to shrink, accurate measurement and control of the overlay have been emphasized for securing more overlay margin. Conventional overlay analysis methods are based on the optical measurement of the overlay mark. However, the overlay data obtained from these optical methods cannot represent the exact misregistration between two layers at the circuit level. The overlay mismatch may arise from the size or pitch difference between the overlay mark and the real pattern. Pattern distortion, caused by CMP or etching, could be a source of the overlay mismatch as well. Another issue is the overlay variation in the real circuit pattern which varies depending on its location. The optical overlay measurement methods, such as IBO and DBO that use overlay mark on the scribeline, are not capable of defining the exact overlay values of the real circuit. Therefore, the overlay values of the real circuit need to be extracted to integrate the semiconductor device properly. The circuit level overlay measurement using CDSEM is time-consuming in extracting enough data to indicate overall trend of the chip. However DBM tool is able to derive sufficient data to display overlay tendency of the real circuit region with high repeatability. An E-beam based DBM(Design Based Metrology) tool can be an alternative overlay measurement method. In this paper, we are going to certify that the overlay values extracted from optical measurement cannot represent the circuit level overlay values. We will also demonstrate the possibility to correct misregistration between two layers using the overlay data obtained from the DBM system.
Asphaltic concrete overlays of rigid and flexible pavements : final report.
DOT National Transportation Integrated Search
1980-10-01
This study evaluated the effect of a given thickness of asphaltic concrete overlay in rehabilitating 53 test sections conforming to the experiment design. This factorial design specified various levels of traffic intensity and overlay thickness for b...
High-throughput electrical characterization for robust overlay lithography control
NASA Astrophysics Data System (ADS)
Devender, Devender; Shen, Xumin; Duggan, Mark; Singh, Sunil; Rullan, Jonathan; Choo, Jae; Mehta, Sohan; Tang, Teck Jung; Reidy, Sean; Holt, Jonathan; Kim, Hyung Woo; Fox, Robert; Sohn, D. K.
2017-03-01
Realizing sensitive, high throughput and robust overlay measurement is a challenge in current 14nm and advanced upcoming nodes with transition to 300mm and upcoming 450mm semiconductor manufacturing, where slight deviation in overlay has significant impact on reliability and yield1). Exponentially increasing number of critical masks in multi-patterning lithoetch, litho-etch (LELE) and subsequent LELELE semiconductor processes require even tighter overlay specification2). Here, we discuss limitations of current image- and diffraction- based overlay measurement techniques to meet these stringent processing requirements due to sensitivity, throughput and low contrast3). We demonstrate a new electrical measurement based technique where resistance is measured for a macro with intentional misalignment between two layers. Overlay is quantified by a parabolic fitting model to resistance where minima and inflection points are extracted to characterize overlay control and process window, respectively. Analyses using transmission electron microscopy show good correlation between actual overlay performance and overlay obtained from fitting. Additionally, excellent correlation of overlay from electrical measurements to existing image- and diffraction- based techniques is found. We also discuss challenges of integrating electrical measurement based approach in semiconductor manufacturing from Back End of Line (BEOL) perspective. Our findings open up a new pathway for accessing simultaneous overlay as well as process window and margins from a robust, high throughput and electrical measurement approach.
Asphaltic concrete overlays of rigid and flexible pavements : interim report No. 1.
DOT National Transportation Integrated Search
1977-09-01
This study evaluated the effect of a given thickness of asphaltic concrete overlay in rehabilitating 53 test sections conforming to the experiment design. This factorial design specified various levels of traffic intensity and overlay thickness for b...
Development of an improved overlay procedure for Oregon : volume III, field manual.
DOT National Transportation Integrated Search
1987-12-01
This report is the third in a three-volume series dealing with the development of an improved overlay design procedure for Oregon. This report presents technical guidelines for using the proposed overlay design procedure. Four areas are described, in...
Flexible pavement overlay design procedures. Volume 2: User manual
NASA Astrophysics Data System (ADS)
Majidzadeh, K.; Ilves, G. J.
1981-08-01
This user manual outlines a procedure for the design of asphaltic concrete overlays on existing asphaltic concrete pavement surfaces. It is intended as a guide to the user on the type and form of information required as input to the procedure and contains all elements necessary for the user to prepare designs for flexible pavement overlays.
Patterned wafer geometry grouping for improved overlay control
NASA Astrophysics Data System (ADS)
Lee, Honggoo; Han, Sangjun; Woo, Jaeson; Park, Junbeom; Song, Changrock; Anis, Fatima; Vukkadala, Pradeep; Jeon, Sanghuck; Choi, DongSub; Huang, Kevin; Heo, Hoyoung; Smith, Mark D.; Robinson, John C.
2017-03-01
Process-induced overlay errors from outside the litho cell have become a significant contributor to the overlay error budget including non-uniform wafer stress. Previous studies have shown the correlation between process-induced stress and overlay and the opportunity for improvement in process control, including the use of patterned wafer geometry (PWG) metrology to reduce stress-induced overlay signatures. Key challenges of volume semiconductor manufacturing are how to improve not only the magnitude of these signatures, but also the wafer to wafer variability. This work involves a novel technique of using PWG metrology to provide improved litho-control by wafer-level grouping based on incoming process induced overlay, relevant for both 3D NAND and DRAM. Examples shown in this study are from 19 nm DRAM manufacturing.
Design of overlays for flexible pavements based on AASHTO road test data.
DOT National Transportation Integrated Search
1978-01-01
The need for a suitable method of designing the thickness of overlays and predicting the performance of the overlaid pavement has recently been recognized. The AASHTO Road Tests included studies on 99 overlays, but they failed to produce conclusive r...
Real cell overlay measurement through design based metrology
NASA Astrophysics Data System (ADS)
Yoo, Gyun; Kim, Jungchan; Park, Chanha; Lee, Taehyeong; Ji, Sunkeun; Jo, Gyoyeon; Yang, Hyunjo; Yim, Donggyu; Yamamoto, Masahiro; Maruyama, Kotaro; Park, Byungjun
2014-04-01
Until recent device nodes, lithography has been struggling to improve its resolution limit. Even though next generation lithography technology is now facing various difficulties, several innovative resolution enhancement technologies, based on 193nm wavelength, were introduced and implemented to keep the trend of device scaling. Scanner makers keep developing state-of-the-art exposure system which guarantees higher productivity and meets a more aggressive overlay specification. "The scaling reduction of the overlay error has been a simple matter of the capability of exposure tools. However, it is clear that the scanner contributions may no longer be the majority component in total overlay performance. The ability to control correctable overlay components is paramount to achieve the desired performance.(2)" In a manufacturing fab, the overlay error, determined by a conventional overlay measurement: by using an overlay mark based on IBO and DBO, often does not represent the physical placement error in the cell area of a memory device. The mismatch may arise from the size or pitch difference between the overlay mark and the cell pattern. Pattern distortion, caused by etching or CMP, also can be a source of the mismatch. Therefore, the requirement of a direct overlay measurement in the cell pattern gradually increases in the manufacturing field, and also in the development level. In order to overcome the mismatch between conventional overlay measurement and the real placement error of layer to layer in the cell area of a memory device, we suggest an alternative overlay measurement method utilizing by design, based metrology tool. A basic concept of this method is shown in figure1. A CD-SEM measurement of the overlay error between layer 1 and 2 could be the ideal method but it takes too long time to extract a lot of data from wafer level. An E-beam based DBM tool provides high speed to cover the whole wafer with high repeatability. It is enabled by using the design as a reference for overlay measurement and a high speed scan system. In this paper, we have demonstrated that direct overlay measurement in the cell area can distinguish the mismatch exactly, instead of using overlay mark. This experiment was carried out for several critical layer in DRAM and Flash memory, using DBM(Design Based Metrology) tool, NGR2170™.
Statewide implementation of very thin overlays.
DOT National Transportation Integrated Search
2014-10-01
Very thin overlays are defined as overlays where the final lift thickness is 1 inch or less. These are designed : to be high performance overlays in that they have to pass both a rutting (Hamburg Wheel tracking Test) and : reflection cracking (Overla...
Mechanistic flexible pavement overlay design program.
DOT National Transportation Integrated Search
2009-07-01
The current Louisiana Department of Transportation and Development (LADOTD) overlay thickness design method follows the Component : Analysis procedure provided in the 1993 AASHTO pavement design guide. Since neither field nor laboratory tests a...
Diffraction based overlay re-assessed
NASA Astrophysics Data System (ADS)
Leray, Philippe; Laidler, David; D'havé, Koen; Cheng, Shaunee
2011-03-01
In recent years, numerous authors have reported the advantages of Diffraction Based Overlay (DBO) over Image Based Overlay (IBO), mainly by comparison of metrology figures of merit such as TIS and TMU. Some have even gone as far as to say that DBO is the only viable overlay metrology technique for advanced technology nodes; 22nm and beyond. Typically the only reported drawback of DBO is the size of the required targets. This severely limits its effective use, when all critical layers of a product, including double patterned layers need to be measured, and in-die overlay measurements are required. In this paper we ask whether target size is the only limitation to the adoption of DBO for overlay characterization and control, or are there other metrics, which need to be considered. For example, overlay accuracy with respect to scanner baseline or on-product process overlay control? In this work, we critically re-assess the strengths and weaknesses of DBO for the applications of scanner baseline and on-product process layer overlay control. A comprehensive comparison is made to IBO. For on product process layer control we compare the performance on critical process layers; Gate, Contact and Metal. In particularly we focus on the response of the scanner to the corrections determined by each metrology technique for each process layer, as a measure of the accuracy. Our results show that to characterize an overlay metrology technique that is suitable for use in advanced technology nodes requires much more than just evaluating the conventional metrology metrics of TIS and TMU.
Computer vision and soft computing for automatic skull-face overlay in craniofacial superimposition.
Campomanes-Álvarez, B Rosario; Ibáñez, O; Navarro, F; Alemán, I; Botella, M; Damas, S; Cordón, O
2014-12-01
Craniofacial superimposition can provide evidence to support that some human skeletal remains belong or not to a missing person. It involves the process of overlaying a skull with a number of ante mortem images of an individual and the analysis of their morphological correspondence. Within the craniofacial superimposition process, the skull-face overlay stage just focuses on achieving the best possible overlay of the skull and a single ante mortem image of the suspect. Although craniofacial superimposition has been in use for over a century, skull-face overlay is still applied by means of a trial-and-error approach without an automatic method. Practitioners finish the process once they consider that a good enough overlay has been attained. Hence, skull-face overlay is a very challenging, subjective, error prone, and time consuming part of the whole process. Though the numerical assessment of the method quality has not been achieved yet, computer vision and soft computing arise as powerful tools to automate it, dramatically reducing the time taken by the expert and obtaining an unbiased overlay result. In this manuscript, we justify and analyze the use of these techniques to properly model the skull-face overlay problem. We also present the automatic technical procedure we have developed using these computational methods and show the four overlays obtained in two craniofacial superimposition cases. This automatic procedure can be thus considered as a tool to aid forensic anthropologists to develop the skull-face overlay, automating and avoiding subjectivity of the most tedious task within craniofacial superimposition. Copyright © 2014 Elsevier Ireland Ltd. All rights reserved.
Overcoming low-alignment signal contrast induced alignment failure by alignment signal enhancement
NASA Astrophysics Data System (ADS)
Lee, Byeong Soo; Kim, Young Ha; Hwang, Hyunwoo; Lee, Jeongjin; Kong, Jeong Heung; Kang, Young Seog; Paarhuis, Bart; Kok, Haico; de Graaf, Roelof; Weichselbaum, Stefan; Droste, Richard; Mason, Christopher; Aarts, Igor; de Boeij, Wim P.
2016-03-01
Overlay is one of the key factors which enables optical lithography extension to 1X node DRAM manufacturing. It is natural that accurate wafer alignment is a prerequisite for good device overlay. However, alignment failures or misalignments are commonly observed in a fab. There are many factors which could induce alignment problems. Low alignment signal contrast is one of the main issues. Alignment signal contrast can be degraded by opaque stack materials or by alignment mark degradation due to processes like CMP. This issue can be compounded by mark sub-segmentation from design rules in combination with double or quadruple spacer process. Alignment signal contrast can be improved by applying new material or process optimization, which sometimes lead to the addition of another process-step with higher costs. If we can amplify the signal components containing the position information and reduce other unwanted signal and background contributions then we can improve alignment performance without process change. In this paper we use ASML's new alignment sensor (as was introduced and released on the NXT:1980Di) and sample wafers with special stacks which can induce poor alignment signal to demonstrate alignment and overlay improvement.
Promoting Learning of Instructional Design via Overlay Design Tools
ERIC Educational Resources Information Center
Carle, Andrew Jacob
2012-01-01
I begin by introducing Virtual Design Apprenticeship (VDA), a learning model--built on a solid foundation of education principles and theories--that promotes learning of design skills via overlay design tools. In VDA, when an individual needs to learn a new design skill or paradigm she is provided accessible, concrete examples that have been…
Jeong, Hyun-Mook; Jeong, Seong-Yong; Kim, Jae-Hyeok; Kim, Bo-Young; Kim, Jun-Sik; Abdel-Hady, Faissal; Wazzan, Abdulaziz A; Al-Turaif, Hamad Ali; Jang, Ho Won; Lee, Jong-Heun
2017-11-29
Co 3 O 4 sensors with a nanoscale TiO 2 or SnO 2 catalytic overlayer were prepared by screen-printing of Co 3 O 4 yolk-shell spheres and subsequent e-beam evaporation of TiO 2 and SnO 2 . The Co 3 O 4 sensors with 5 nm thick TiO 2 and SnO 2 overlayers showed high responses (resistance ratios) to 5 ppm xylene (14.5 and 28.8) and toluene (11.7 and 16.2) at 250 °C with negligible responses to interference gases such as ethanol, HCHO, CO, and benzene. In contrast, the pure Co 3 O 4 sensor did not show remarkable selectivity toward any specific gas. The response and selectivity to methylbenzenes and ethanol could be systematically controlled by selecting the catalytic overlayer material, varying the overlayer thickness, and tuning the sensing temperature. The significant enhancement of the selectivity for xylene and toluene was attributed to the reforming of less reactive methylbenzenes into more reactive and smaller species and oxidative filtering of other interference gases, including ubiquitous ethanol. The concurrent control of the gas reforming and oxidative filtering processes using a nanoscale overlayer of catalytic oxides provides a new, general, and powerful tool for designing highly selective and sensitive oxide semiconductor gas sensors.
Simultaneous overlay and CD measurement for double patterning: scatterometry and RCWA approach
NASA Astrophysics Data System (ADS)
Li, Jie; Liu, Zhuan; Rabello, Silvio; Dasari, Prasad; Kritsun, Oleg; Volkman, Catherine; Park, Jungchul; Singh, Lovejeet
2009-03-01
As optical lithography advances to 32 nm technology node and beyond, double patterning technology (DPT) has emerged as an attractive solution to circumvent the fundamental optical limitations. DPT poses unique demands on critical dimension (CD) uniformity and overlay control, making the tolerance decrease much faster than the rate at which critical dimension shrinks. This, in turn, makes metrology even more challenging. In the past, multi-pad diffractionbased overlay (DBO) using empirical approach has been shown to be an effective approach to measure overlay error associated with double patterning [1]. In this method, registration errors for double patterning were extracted from specially designed diffraction targets (three or four pads for each direction); CD variation is assumed negligible within each group of adjacent pads and not addressed in the measurement. In another paper, encouraging results were reported with a first attempt at simultaneously extracting overlay and CD parameters using scatterometry [2]. In this work, we apply scatterometry with a rigorous coupled wave analysis (RCWA) approach to characterize two double-patterning processes: litho-etch-litho-etch (LELE) and litho-freeze-litho-etch (LFLE). The advantage of performing rigorous modeling is to reduce the number of pads within each measurement target, thus reducing space requirement and improving throughput, and simultaneously extract CD and overlay information. This method measures overlay errors and CDs by fitting the optical signals with spectra calculated from a model of the targets. Good correlation is obtained between the results from this method and that of several reference techniques, including empirical multi-pad DBO, CD-SEM, and IBO. We also perform total measurement uncertainty (TMU) analysis to evaluate the overall performance. We demonstrate that scatterometry provides a promising solution to meet the challenging overlay metrology requirement in DPT.
Advancements of diffraction-based overlay metrology for double patterning
NASA Astrophysics Data System (ADS)
Li, Jie; Kritsun, Oleg; Liu, Yongdong; Dasari, Prasad; Weher, Ulrich; Volkman, Catherine; Mazur, Martin; Hu, Jiangtao
2011-03-01
As the dimensions of integrated circuit continue to shrink, diffraction based overlay (DBO) technologies have been developed to address the tighter overlay control challenges. Previously data of high accuracy and high precision were reported for litho-etch-litho-etch double patterning (DP) process using normal incidence spectroscopic reflectometry on specially designed targets composed of 1D gratings in x and y directions. Two measurement methods, empirical algorithm (eDBO) using four pads per direction (2x4 target) and modeling based algorithm (mDBO) using two pads per direction (2x2 target) were performed. In this work, we apply DBO techniques to measure overlay errors for a different DP process, litho-freeze-litho-etch process. We explore the possibility of further reducing number of pads in a DBO target using mDBO. For standard targets composed of 1D gratings, we reported results for eDBO 2x4 targets, mDBO 2x2 targets, and mDBO 2x1 target. The results of all three types of targets are comparable in terms of accuracy, dynamic precision, and TIS. TMU (not including tool matching) is less than 0.1nm. In addition, we investigated the possibility of measuring overlay with one single pad that contains 2D gratings. We achieved good correlation to blossom measurements. TMU (not including tool matching) is ~ 0.2nm. To our best knowledge, this is the first time that DBO results are reported on a single pad. eDBO allows quick recipe setup but takes more space and measurement time. Although mDBO needs details of optical properties and modeling, it offers smaller total target size and much faster throughput, which is important in high volume manufacturing environment.
Mechanistic-empirical asphalt overlay thickness design and analysis system.
DOT National Transportation Integrated Search
2009-10-01
The placement of an asphalt overlay is the most common method used by the Texas Department of Transportation (TxDOT) to rehabilitate : existing asphalt and concrete pavements. The type of overlay and its required thickness are important decisions tha...
Voice over internet protocol with prepaid calling card solutions
NASA Astrophysics Data System (ADS)
Gunadi, Tri
2001-07-01
The VoIP technology is growing up rapidly, it has big network impact on PT Telkom Indonesia, the bigger telecommunication operator in Indonesia. Telkom has adopted VoIP and one other technology, Intelligent Network (IN). We develop those technologies together in one service product, called Internet Prepaid Calling Card (IPCC). IPCC is becoming new breakthrough for the Indonesia telecommunication services especially on VoIP and Prepaid Calling Card solutions. Network architecture of Indonesia telecommunication consists of three layer, Local, Tandem and Trunck Exchange layer. Network development researches for IPCC architecture are focus on network overlay hierarchy, Internet and PSTN. With this design hierarchy the goal of Interworking PSTN, VoIP and IN calling card, become reality. Overlay design for IPCC is not on Trunck Exchange, this is the new architecture, these overlay on Tandem and Local Exchange, to make the faster call processing. The nodes added: Gateway (GW) and Card Management Center (CMC) The GW do interfacing between PSTN and Internet Network used ISDN-PRA and Ethernet. The other functions are making bridge on circuit (PSTN) with packet (VoIP) based and real time billing process. The CMC used for data storage, pin validation, report activation, tariff system, directory number and all the administration transaction. With two nodes added the IPCC service offered to the market.
Understanding overlay signatures using machine learning on non-lithography context information
NASA Astrophysics Data System (ADS)
Overcast, Marshall; Mellegaard, Corey; Daniel, David; Habets, Boris; Erley, Georg; Guhlemann, Steffen; Thrun, Xaver; Buhl, Stefan; Tottewitz, Steven
2018-03-01
Overlay errors between two layers can be caused by non-lithography processes. While these errors can be compensated by the run-to-run system, such process and tool signatures are not always stable. In order to monitor the impact of non-lithography context on overlay at regular intervals, a systematic approach is needed. Using various machine learning techniques, significant context parameters that relate to deviating overlay signatures are automatically identified. Once the most influential context parameters are found, a run-to-run simulation is performed to see how much improvement can be obtained. The resulting analysis shows good potential for reducing the influence of hidden context parameters on overlay performance. Non-lithographic contexts are significant contributors, and their automatic detection and classification will enable the overlay roadmap, given the corresponding control capabilities.
Performance evaluation of bridges with structural bridge deck overlays (SBDO).
DOT National Transportation Integrated Search
2006-03-01
Structural Bridge Deck Overlay (SBDO) involves applying 6 to 10 inches (150 to 200 mm) of normal weight, class AA, reinforced concrete directly to a bridges original slab. The overlay is designed to increase the deck elevation to an extent that st...
Implementation and benefits of advanced process control for lithography CD and overlay
NASA Astrophysics Data System (ADS)
Zavyalova, Lena; Fu, Chong-Cheng; Seligman, Gary S.; Tapp, Perry A.; Pol, Victor
2003-05-01
Due to the rapidly reduced imaging process windows and increasingly stingent device overlay requirements, sub-130 nm lithography processes are more severely impacted than ever by systamic fault. Limits on critical dimensions (CD) and overlay capability further challenge the operational effectiveness of a mix-and-match environment using multiple lithography tools, as such mode additionally consumes the available error budgets. Therefore, a focus on advanced process control (APC) methodologies is key to gaining control in the lithographic modules for critical device levels, which in turn translates to accelerated yield learning, achieving time-to-market lead, and ultimately a higher return on investment. This paper describes the implementation and unique challenges of a closed-loop CD and overlay control solution in high voume manufacturing of leading edge devices. A particular emphasis has been placed on developing a flexible APC application capable of managing a wide range of control aspects such as process and tool drifts, single and multiple lot excursions, referential overlay control, 'special lot' handling, advanced model hierarchy, and automatic model seeding. Specific integration cases, including the multiple-reticle complementary phase shift lithography process, are discussed. A continuous improvement in the overlay and CD Cpk performance as well as the rework rate has been observed through the implementation of this system, and the results are studied.
Overlay design method based on visual pavement distress.
DOT National Transportation Integrated Search
1978-01-01
A method for designing the thickness of overlays for bituminous concrete pavements in Virginia is described. In this method the thickness is calculated by rating the amount and severity of observed pavement distress and determining the total accumula...
NASA Astrophysics Data System (ADS)
Dos Santos Ferreira, Olavio; Sadat Gousheh, Reza; Visser, Bart; Lie, Kenrick; Teuwen, Rachel; Izikson, Pavel; Grzela, Grzegorz; Mokaberi, Babak; Zhou, Steve; Smith, Justin; Husain, Danish; Mandoy, Ram S.; Olvera, Raul
2018-03-01
Ever increasing need for tighter on-product overlay (OPO), as well as enhanced accuracy in overlay metrology and methodology, is driving semiconductor industry's technologists to innovate new approaches to OPO measurements. In case of High Volume Manufacturing (HVM) fabs, it is often critical to strive for both accuracy and robustness. Robustness, in particular, can be challenging in metrology since overlay targets can be impacted by proximity of other structures next to the overlay target (asymmetric effects), as well as symmetric stack changes such as photoresist height variations. Both symmetric and asymmetric contributors have impact on robustness. Furthermore, tweaking or optimizing wafer processing parameters for maximum yield may have an adverse effect on physical target integrity. As a result, measuring and monitoring physical changes or process abnormalities/artefacts in terms of new Key Performance Indicators (KPIs) is crucial for the end goal of minimizing true in-die overlay of the integrated circuits (ICs). IC manufacturing fabs often relied on CD-SEM in the past to capture true in-die overlay. Due to destructive and intrusive nature of CD-SEMs on certain materials, it's desirable to characterize asymmetry effects for overlay targets via inline KPIs utilizing YieldStar (YS) metrology tools. These KPIs can also be integrated as part of (μDBO) target evaluation and selection for final recipe flow. In this publication, the Holistic Metrology Qualification (HMQ) flow was extended to account for process induced (asymmetric) effects such as Grating Imbalance (GI) and Bottom Grating Asymmetry (BGA). Local GI typically contributes to the intrafield OPO whereas BGA typically impacts the interfield OPO, predominantly at the wafer edge. Stack height variations highly impact overlay metrology accuracy, in particular in case of multi-layer LithoEtch Litho-Etch (LELE) overlay control scheme. Introducing a GI impact on overlay (in nm) KPI check quantifies the grating imbalance impact on overlay, whereas optimizing for accuracy using self-reference captures the bottom grating asymmetry effect. Measuring BGA after each process step before exposure of the top grating helps to identify which specific step introduces the asymmetry in the bottom grating. By evaluating this set of KPI's to a BEOL LELE overlay scheme, we can enhance robustness of recipe selection and target selection. Furthermore, these KPIs can be utilized to highlight process and equipment abnormalities. In this work, we also quantified OPO results with a self-contained methodology called Triangle Method. This method can be utilized for LELE layers with a common target and reference. This allows validating general μDBO accuracy, hence reducing the need for CD-SEM verification.
Application of overlay modeling and control with Zernike polynomials in an HVM environment
NASA Astrophysics Data System (ADS)
Ju, JaeWuk; Kim, MinGyu; Lee, JuHan; Nabeth, Jeremy; Jeon, Sanghuck; Heo, Hoyoung; Robinson, John C.; Pierson, Bill
2016-03-01
Shrinking technology nodes and smaller process margins require improved photolithography overlay control. Generally, overlay measurement results are modeled with Cartesian polynomial functions for both intra-field and inter-field models and the model coefficients are sent to an advanced process control (APC) system operating in an XY Cartesian basis. Dampened overlay corrections, typically via exponentially or linearly weighted moving average in time, are then retrieved from the APC system to apply on the scanner in XY Cartesian form for subsequent lot exposure. The goal of the above method is to process lots with corrections that target the least possible overlay misregistration in steady state as well as in change point situations. In this study, we model overlay errors on product using Zernike polynomials with same fitting capability as the process of reference (POR) to represent the wafer-level terms, and use the standard Cartesian polynomials to represent the field-level terms. APC calculations for wafer-level correction are performed in Zernike basis while field-level calculations use standard XY Cartesian basis. Finally, weighted wafer-level correction terms are converted to XY Cartesian space in order to be applied on the scanner, along with field-level corrections, for future wafer exposures. Since Zernike polynomials have the property of being orthogonal in the unit disk we are able to reduce the amount of collinearity between terms and improve overlay stability. Our real time Zernike modeling and feedback evaluation was performed on a 20-lot dataset in a high volume manufacturing (HVM) environment. The measured on-product results were compared to POR and showed a 7% reduction in overlay variation including a 22% terms variation. This led to an on-product raw overlay Mean + 3Sigma X&Y improvement of 5% and resulted in 0.1% yield improvement.
Design and construction of a bonded fiber concrete overlay of CRCP : final report.
DOT National Transportation Integrated Search
1992-01-01
The purpose of this study was to evaluate a bonded steel fiber reinforced concrete overlay on an existing 8-inch CRC pavement on Interstate 10 south of Baton Rough, LA. The project objectives were to provide an overlay with a high probability for lon...
Fabrication of magnetic bubble memory overlay
NASA Technical Reports Server (NTRS)
1973-01-01
Self-contained magnetic bubble memory overlay is fabricated by process that employs epitaxial deposition to form multi-layered complex of magnetically active components on single chip. Overlay fabrication comprises three metal deposition steps followed by subtractive etch.
Overlay leaves litho: impact of non-litho processes on overlay and compensation
NASA Astrophysics Data System (ADS)
Ruhm, Matthias; Schulz, Bernd; Cotte, Eric; Seltmann, Rolf; Hertzsch, Tino
2014-10-01
According to the ITRS roadmap [1], the overlay requirement for the 28nm node is 8nm. If we compare this number with the performance given by tool vendors for their most advanced immersion systems (which is < 3nm), there seems to remain a large margin. Does that mean that today's leading edge Fab has an easy life? Unfortunately not, as other contributors affecting overlay are emerging. Mask contributions and so-called non-linear wafer distortions are known effects that can impact overlay quite significantly. Furthermore, it is often forgotten that downstream (post-litho) processes can impact the overlay as well. Thus, it can be required to compensate for the effects of subsequent processes already at the lithography operation. Within our paper, we will briefly touch on the wafer distortion topic and discuss the limitations of lithography compensation techniques such as higher order corrections versus solving the root cause of the distortions. The primary focus will be on the impact of the etch processes on the pattern placement error. We will show how individual layers can get affected differently by showing typical wafer signatures. However, in contrast to the above-mentioned wafer distortion topic, lithographic compensation techniques can be highly effective to reduce the placement error significantly towards acceptable levels (see Figure 1). Finally we will discuss the overall overlay budget for a 28nm contact to gate case by taking the impact of the individual process contributors into account.
Continued implementation of high performance thin overlays in Texas districts.
DOT National Transportation Integrated Search
2017-06-22
As part of Research Project 0-5598, outputs include guidelines and specifications on how a district can design and construct long-life overlays using the concept of balanced mix design; and training materials describing the best ways to select, desig...
Advanced overlay: sampling and modeling for optimized run-to-run control
NASA Astrophysics Data System (ADS)
Subramany, Lokesh; Chung, WoongJae; Samudrala, Pavan; Gao, Haiyong; Aung, Nyan; Gomez, Juan Manuel; Gutjahr, Karsten; Park, DongSuk; Snow, Patrick; Garcia-Medina, Miguel; Yap, Lipkong; Demirer, Onur Nihat; Pierson, Bill; Robinson, John C.
2016-03-01
In recent years overlay (OVL) control schemes have become more complicated in order to meet the ever shrinking margins of advanced technology nodes. As a result, this brings up new challenges to be addressed for effective run-to- run OVL control. This work addresses two of these challenges by new advanced analysis techniques: (1) sampling optimization for run-to-run control and (2) bias-variance tradeoff in modeling. The first challenge in a high order OVL control strategy is to optimize the number of measurements and the locations on the wafer, so that the "sample plan" of measurements provides high quality information about the OVL signature on the wafer with acceptable metrology throughput. We solve this tradeoff between accuracy and throughput by using a smart sampling scheme which utilizes various design-based and data-based metrics to increase model accuracy and reduce model uncertainty while avoiding wafer to wafer and within wafer measurement noise caused by metrology, scanner or process. This sort of sampling scheme, combined with an advanced field by field extrapolated modeling algorithm helps to maximize model stability and minimize on product overlay (OPO). Second, the use of higher order overlay models means more degrees of freedom, which enables increased capability to correct for complicated overlay signatures, but also increases sensitivity to process or metrology induced noise. This is also known as the bias-variance trade-off. A high order model that minimizes the bias between the modeled and raw overlay signature on a single wafer will also have a higher variation from wafer to wafer or lot to lot, that is unless an advanced modeling approach is used. In this paper, we characterize the bias-variance trade off to find the optimal scheme. The sampling and modeling solutions proposed in this study are validated by advanced process control (APC) simulations to estimate run-to-run performance, lot-to-lot and wafer-to- wafer model term monitoring to estimate stability and ultimately high volume manufacturing tests to monitor OPO by densely measured OVL data.
Intra-field on-product overlay improvement by application of RegC and TWINSCAN corrections
NASA Astrophysics Data System (ADS)
Sharoni, Ofir; Dmitriev, Vladimir; Graitzer, Erez; Perets, Yuval; Gorhad, Kujan; van Haren, Richard; Cekli, Hakki E.; Mulkens, Jan
2015-03-01
The on product overlay specification and Advanced Process Control (APC) is getting extremely challenging particularly after the introduction of multi-patterning applications like Spacer Assisted Double Patterning (SADP) and multipatterning techniques like N-repetitive Litho-Etch steps (LEN, N >= 2). When the latter is considered, most of the intrafield overlay contributors drop out of the overlay budget. This is a direct consequence of the fact that the scanner settings (like dose, illumination settings, etc.) as well as the subsequent processing steps can be made very similar for two consecutive Litho-Etch layers. The major overlay contributor that may require additional attention is the Image Placement Error (IPE). When the inter-layer overlay is considered, controlling the intra-field overlay contribution gets more complicated. In addition to the IPE contribution, the TWINSCANTM lens fingerprint in combination with the exposure settings is going to play a role as well. Generally speaking, two subsequent functional layers have different exposure settings. This results in a (non-reticle) additional overlay contribution. In this paper, we have studied the wafer overlay correction capability by RegC® in addition to the TWINSCANTM intrafield corrections to improve the on product overlay performance. RegC® is a reticle intra-volume laser writing technique that causes a predictable deformation element (RegC® deformation element) inside the quartz (Qz) material of a reticle. This technique enables to post-process an existing reticle to correct for instance for IPE. Alternatively, a pre-determined intra-field fingerprint can be added to the reticle such that it results in a straight field after exposure. This second application might be very powerful to correct for instance for (cold) lens fingerprints that cannot be corrected by the scanner itself. Another possible application is the intra-field processing fingerprint. One should realize that a RegC® treatment of a reticle generally results in global distortion of the reticle. This is not a problem as long as these global distortions can be corrected by the TWINSCANTM system (currently up to the third order). It is anticipated that the combination of the RegC® and the TWINSCANTM corrections act as complementary solutions. These solutions perfectly fit into the ASML Litho InSight (LIS) product in which feedforward and feedback corrections based on YieldStar overlay measurements are used to improve the on product overlay.
NASA Astrophysics Data System (ADS)
Noyes, Ben F.; Mokaberi, Babak; Mandoy, Ram; Pate, Alex; Huijgen, Ralph; McBurney, Mike; Chen, Owen
2017-03-01
Reducing overlay error via an accurate APC feedback system is one of the main challenges in high volume production of the current and future nodes in the semiconductor industry. The overlay feedback system directly affects the number of dies meeting overlay specification and the number of layers requiring dedicated exposure tools through the fabrication flow. Increasing the former number and reducing the latter number is beneficial for the overall efficiency and yield of the fabrication process. An overlay feedback system requires accurate determination of the overlay error, or fingerprint, on exposed wafers in order to determine corrections to be automatically and dynamically applied to the exposure of future wafers. Since current and future nodes require correction per exposure (CPE), the resolution of the overlay fingerprint must be high enough to accommodate CPE in the overlay feedback system, or overlay control module (OCM). Determining a high resolution fingerprint from measured data requires extremely dense overlay sampling that takes a significant amount of measurement time. For static corrections this is acceptable, but in an automated dynamic correction system this method creates extreme bottlenecks for the throughput of said system as new lots have to wait until the previous lot is measured. One solution is using a less dense overlay sampling scheme and employing computationally up-sampled data to a dense fingerprint. That method uses a global fingerprint model over the entire wafer; measured localized overlay errors are therefore not always represented in its up-sampled output. This paper will discuss a hybrid system shown in Fig. 1 that combines a computationally up-sampled fingerprint with the measured data to more accurately capture the actual fingerprint, including local overlay errors. Such a hybrid system is shown to result in reduced modelled residuals while determining the fingerprint, and better on-product overlay performance.
SEM based overlay measurement between resist and buried patterns
NASA Astrophysics Data System (ADS)
Inoue, Osamu; Okagawa, Yutaka; Hasumi, Kazuhisa; Shao, Chuanyu; Leray, Philippe; Lorusso, Gian; Baudemprez, Bart
2016-03-01
With the continuous shrink in pattern size and increased density, overlay control has become one of the most critical issues in semiconductor manufacturing. Recently, SEM based overlay of AEI (After Etch Inspection) wafer has been used for reference and optimization of optical overlay (both Image Based Overlay (IBO) and Diffraction Based Overlay (DBO)). Overlay measurement at AEI stage contributes monitor and forecast the yield after formation by etch and calibrate optical measurement tools. however those overlay value seems difficult directly for feedback to a scanner. Therefore, there is a clear need to have SEM based overlay measurements of ADI (After Develop Inspection) wafers in order to serve as reference for optical overlay and make necessary corrections before wafers go to etch. Furthermore, to make the corrections as accurate as possible, actual device like feature dimensions need to be measured post ADI. This device size measurement is very unique feature of CDSEM , which can be measured with smaller area. This is currently possible only with the CD-SEM. This device size measurement is very unique feature of CD-SEM , which can be measured with smaller area. In this study, we assess SEM based overlay measurement of ADI and AEI wafer by using a sample from an N10 process flow. First, we demonstrate SEM based overlay performance at AEI by using dual damascene process for Via 0 (V0) and metal 1 (M1) layer. We also discuss the overlay measurements between litho-etch-litho stages of a triple patterned M1 layer and double pattern V0. Second, to illustrate the complexities in image acquisition and measurement we will measure overlay between M1B resist and buried M1A-Hard mask trench. Finally, we will show how high accelerating voltage can detect buried pattern information by BSE (Back Scattering Electron). In this paper we discuss the merits of this method versus standard optical metrology based corrections.
ArF step-and-scan system with 0.75 NA for the 0.10μm node
NASA Astrophysics Data System (ADS)
Vleeming, Bert; Heskamp, Barbra; Bakker, Hans; Verstappen, Leon; Finders, Jo; Stoeten, Jan; Boerret, Rainer; Roempp, Oliver
2001-09-01
It is widely expected that 193 nm lithography will be the technology of choice for volume production of the 0.10 micrometer device generation. For this purpose the PAS5500/1100TM Step & Scan system, the second generation ArF tool, was developed. It is based on the PAS5500/900TM, the body of which has been adapted to fit the new 0.75 NA StarlithTM projection optics. This high NA enables mass manufacturing of devices following the 0.10 micrometer design rule. The system features a 10 W 2 kHz ArF laser and the AERIALTM II illuminator that can be equipped with a QUASARTM (multipole) option. In order to minimize wafer processing influences on overlay performance ATHENATM off- axis alignment with phase modulator is implemented. The usage of Reticle Blue Alignment will further improve overlay as well as increase the system stability. In this paper the PAS5500/1100TM system layout is discussed and the first imaging and overlay results are presented. Imaging performance is illustrated by SEM pictures of 0.10 micrometer dense lines, 0.15, 0.13 and 0.12 micrometer dense contact holes, 0.10 micrometer DRAM isolation patterns, image plane deviation and system distortion fingerprints. Alignment reproducibility and single machine overlay results demonstrate the overlay capability.
Development of an improved overlay design procedure for Oregon : volume II, evaluation of procedure.
DOT National Transportation Integrated Search
1987-12-01
This report is the second in a three-volume series dealing with the development of an improved overlay design procedure for Oregon. This report presents the results of the second-year findings. Data from five projects were collected and analyzed usin...
Design and performance evaluation of very thin overlays in Texas.
DOT National Transportation Integrated Search
2009-06-01
Very thin overlays 1-inch thick or less were placed as surface layers on five major highways in Texas. : These mixes were designed in the laboratory to have a balance of good rut resistance as measured by : TxDOTs Hamburg Wheel Tracking test and g...
DOT National Transportation Integrated Search
2003-11-01
The objective of the research was to compare the performance of fiber reinforced and plain PCC concrete overlay when used as a thin non-dowelled overlay on top of a rubblized, distressed concrete pavement. The experiment was conducted at the Accelera...
Approaches of multilayer overlay process control for 28nm FD-SOI derivative applications
NASA Astrophysics Data System (ADS)
Duclaux, Benjamin; De Caunes, Jean; Perrier, Robin; Gatefait, Maxime; Le Gratiet, Bertrand; Chapon, Jean-Damien; Monget, Cédric
2018-03-01
Derivative technology like embedded Non-Volatile Memories (eNVM) is raising new types of challenges on the "more than Moore" path. By its construction: overlay is critical across multiple layers, by its running mode: usage of high voltage are stressing leakages and breakdown, and finally with its targeted market: Automotive, Industry automation, secure transactions… which are all requesting high device reliability (typically below 1ppm level). As a consequence, overlay specifications are tights, not only between one layer and its reference, but also among the critical layers sharing the same reference. This work describes a broad picture of the key points for multilayer overlay process control in the case of a 28nm FD-SOI technology and its derivative flows. First, the alignment trees of the different flow options have been optimized using a realistic process assumptions calculation for indirect overlay. Then, in the case of a complex alignment tree involving heterogeneous scanner toolset, criticality of tool matching between reference layer and critical layers of the flow has been highlighted. Improving the APC control loops of these multilayer dependencies has been studied with simulations of feed-forward as well as implementing new rework algorithm based on multi-measures. Finally, the management of these measurement steps raises some issues for inline support and using calculations or "virtual overlay" could help to gain some tool capability. A first step towards multilayer overlay process control has been taken.
DOT National Transportation Integrated Search
1986-12-01
This report is the first in a three-volume series dealing with the development of an improved overlay design procedure for Oregon. This report presents the results of the first-year findings and includes: (1) a detailed review of the literature; (2) ...
DOT National Transportation Integrated Search
1998-10-01
The overall objectives of this study were (1) to provide basic performance evaluation of asphalt overlays on rigid pavements and (2) to provide a design tool for supporting a long-range rehabilitation plan for the US 59 : corridor in the Lufkin Distr...
Asphaltic concrete overlays of rigid and flexible pavements
NASA Astrophysics Data System (ADS)
Kinchen, R. W.; Temple, W. H.
1980-10-01
The development of a mechanistic approach to overlay thickness selection is described. The procedure utilizes a deflection analysis to determine pavement rehabilitation needs. Design guides for selecting the overlay thickness are presented. Tolerable deflection-traffic load relationships and the deflection attenuation properties of asphaltic concrete were developed, representing the subgrade support conditions and properties of materials used in Louisiana. All deflection measurements on asphaltic concrete were corrected for the effect of temperature. Deflection measurements taken before and after overlay were also adjusted to minimize the effects of seasonal subgrade moisture variation.
Evaluating diffraction based overlay metrology for double patterning technologies
NASA Astrophysics Data System (ADS)
Saravanan, Chandra Saru; Liu, Yongdong; Dasari, Prasad; Kritsun, Oleg; Volkman, Catherine; Acheta, Alden; La Fontaine, Bruno
2008-03-01
Demanding sub-45 nm node lithographic methodologies such as double patterning (DPT) pose significant challenges for overlay metrology. In this paper, we investigate scatterometry methods as an alternative approach to meet these stringent new metrology requirements. We used a spectroscopic diffraction-based overlay (DBO) measurement technique in which registration errors are extracted from specially designed diffraction targets for double patterning. The results of overlay measurements are compared to traditional bar-in-bar targets. A comparison between DBO measurements and CD-SEM measurements is done to show the correlation between the two approaches. We discuss the total measurement uncertainty (TMU) requirements for sub-45 nm nodes and compare TMU from the different overlay approaches.
DOT National Transportation Integrated Search
1978-01-01
Data collected on 111 interstate highway projects in Virginia were analyzed by multi-regression analysis and the rating coefficient for each type of distress determined. By this means, the total pavement distress and, hence, the maintenance rating of...
Shanks, Ryan A; Robertson, Chuck L; Haygood, Christian S; Herdliksa, Anna M; Herdliska, Heather R; Lloyd, Steven A
2017-01-01
Introductory biology courses provide an important opportunity to prepare students for future courses, yet existing cookbook labs, although important in their own way, fail to provide many of the advantages of semester-long research experiences. Engaging, authentic research experiences aid biology students in meeting many learning goals. Therefore, overlaying a research experience onto the existing lab structure allows faculty to overcome barriers involving curricular change. Here we propose a working model for this overlay design in an introductory biology course and detail a means to conduct this lab with minimal increases in student and faculty workloads. Furthermore, we conducted exploratory factor analysis of the Experimental Design Ability Test (EDAT) and uncovered two latent factors which provide valid means to assess this overlay model's ability to increase advanced experimental design abilities. In a pre-test/post-test design, we demonstrate significant increases in both basic and advanced experimental design abilities in an experimental and comparison group. We measured significantly higher gains in advanced experimental design understanding in students in the experimental group. We believe this overlay model and EDAT factor analysis contribute a novel means to conduct and assess the effectiveness of authentic research experiences in an introductory course without major changes to the course curriculum and with minimal increases in faculty and student workloads.
Overlay accuracy with respect to device scaling
NASA Astrophysics Data System (ADS)
Leray, Philippe; Laidler, David; Cheng, Shaunee
2012-03-01
Overlay metrology performance is usually reported as repeatability, matching between tools or optics aberrations distorting the measurement (Tool induced shift or TIS). Over the last few years, improvement of these metrics by the tool suppliers has been impressive. But, what about accuracy? Using different target types, we have already reported small differences in the mean value as well as fingerprint [1]. These differences make the correctables questionable. Which target is correct and therefore which translation, scaling etc. values should be fed back to the scanner? In this paper we investigate the sources of these differences, using several approaches. First, we measure the response of different targets to offsets programmed in a test vehicle. Second, we check the response of the same overlay targets to overlay errors programmed into the scanner. We compare overlay target designs; what is the contribution of the size of the features that make up the target? We use different overlay measurement techniques; is DBO (Diffraction Based Overlay) more accurate than IBO (Image Based Overlay)? We measure overlay on several stacks; what is the stack contribution to inaccuracy? In conclusion, we offer an explanation for the observed differences and propose a solution to reduce them.
NASA Technical Reports Server (NTRS)
Coker, B. L.; Kind, T. C.; Smith, W. F., Jr.; Weber, N. V.
1981-01-01
Created for analyzing and processing digital data such as that collected by multispectral scanners or digitized from maps, ELAS is designed for ease of user operation and includes its own FORTRAN operating monitor and an expandable set of application modules which are FORTRAN overlays. On those machines that do not support FORTRAN overlaying, the modules exist as subprograms. The subsystem can be implemented on most 16-bit or 32-bit machines and is capable of, but not limited to, operating on low-cost minicomputer systems. The recommended hardware configuration for ELAS and a representative listing of some operating and application modules are presented.
High-volume manufacturing device overlay process control
NASA Astrophysics Data System (ADS)
Lee, Honggoo; Han, Sangjun; Woo, Jaeson; Lee, DongYoung; Song, ChangRock; Heo, Hoyoung; Brinster, Irina; Choi, DongSub; Robinson, John C.
2017-03-01
Overlay control based on DI metrology of optical targets has been the primary basis for run-to-run process control for many years. In previous work we described a scenario where optical overlay metrology is performed on metrology targets on a high frequency basis including every lot (or most lots) at DI. SEM based FI metrology is performed ondevice in-die as-etched on an infrequent basis. Hybrid control schemes of this type have been in use for many process nodes. What is new is the relative size of the NZO as compared to the overlay spec, and the need to find more comprehensive solutions to characterize and control the size and variability of NZO at the 1x nm node: sampling, modeling, temporal frequency and control aspects, as well as trade-offs between SEM throughput and accuracy.
Bituminous concrete overlay studies.
DOT National Transportation Integrated Search
1971-01-01
Deflection tests conducted on eight sections of primary highway, both before and after asphaltic concrete resurfacings, were analyzed as a study of the utility of such tests in the design of overlays. The application of tentative traffic and allowabl...
Natural resources information system.
NASA Technical Reports Server (NTRS)
Leachtenauer, J. C.; Woll, A. M.
1972-01-01
A computer-based Natural Resources Information System was developed for the Bureaus of Indian Affairs and Land Management. The system stores, processes and displays data useful to the land manager in the decision making process. Emphasis is placed on the use of remote sensing as a data source. Data input consists of maps, imagery overlays, and on-site data. Maps and overlays are entered using a digitizer and stored as irregular polygons, lines and points. Processing functions include set intersection, union and difference and area, length and value computations. Data output consists of computer tabulations and overlays prepared on a drum plotter.
Overlay degradation induced by film stress
NASA Astrophysics Data System (ADS)
Huang, Chi-hao; Liu, Yu-Lin; Luo, Shing-Ann; Yang, Mars; Yang, Elvis; Hung, Yung-Tai; Luoh, Tuung; Yang, T. H.; Chen, K. C.
2017-03-01
The semiconductor industry has continually sought the approaches to produce memory devices with increased memory cells per memory die. One way to meet the increasing storage capacity demand and reduce bit cost of NAND flash memories is 3D stacked flash cell array. In constructing 3D NAND flash memories, increasing the number of stacked layers to build more memory cell number per unit area necessitates many high-aspect-ratio etching processes accordingly the incorporation of thick and unique etching hard-mask scheme has been indispensable. However, the ever increasingly thick requirement on etching hard-mask has made the hard-mask film stress control extremely important for maintaining good process qualities. The residual film stress alters the wafer shape consequently several process impacts have been readily observed across wafer, such as wafer chucking error on scanner, film peeling, materials coating and baking defects, critical dimension (CD) non-uniformity and overlay degradation. This work investigates the overlay and residual order performance indicator (ROPI) degradation coupling with increasingly thick advanced patterning film (APF) etching hard-mask. Various APF films deposited by plasma enhanced chemical vapor deposition (PECVD) method under different deposition temperatures, chemicals combinations, radio frequency powers and chamber pressures were carried out. And -342MPa to +80MPa film stress with different film thicknesses were generated for the overlay performance study. The results revealed the overlay degradation doesn't directly correlate with convex or concave wafer shapes but the magnitude of residual APF film stress, while increasing the APF thickness will worsen the overlay performance and ROPI strongly. High-stress APF film was also observed to enhance the scanner chucking difference and lead to more serious wafer to wafer overlay variation. To reduce the overlay degradation from ever increasingly thick APF etching hard-mask, optimizing the film stress of APF is the most effective way and high order overlay compensation is also helpful.
Resource Kit Tips for Teaching Textiles and Clothing.
ERIC Educational Resources Information Center
New York State Education Dept., Albany. Bureau of Continuing Education Curriculum Development.
This kit has been designed to acquaint the instructor of adult textiles and clothing programs with some of the teaching aids that might be used to improve the learning process. The main parts of the publication include: Preparing and Using Transparencies; Developing a Learning Experience Using a Transparency; A Master Transparency with Overlays;…
In-die mask registration measurement on 28nm-node and beyond
NASA Astrophysics Data System (ADS)
Chen, Shen Hung; Cheng, Yung Feng; Chen, Ming Jui
2013-09-01
As semiconductor go to smaller node, the critical dimension (CD) of process become more and more small. For lithography, RET (Resolution Enhancement Technology) applications can be used for wafer printing of smaller CD/pitch on 28nm node and beyond. SMO (Source Mask Optimization), DPT (Double Patterning Technology) and SADP (Self-Align Double Patterning) can provide lower k1 value for lithography. In another way, image placement error and overlay control also become more and more important for smaller chip size (advanced node). Mask registration (image placement error) and mask overlay are important factors to affect wafer overlay control/performance especially for DPT or SADP. In traditional method, the designed registration marks (cross type, square type) with larger CD were put into scribe-line of mask frame for registration and overlay measurement. However, these patterns are far way from real patterns. It does not show the registration of real pattern directly and is not a convincing method. In this study, the in-die (in-chip) registration measurement is introduced. We extract the dummy patterns that are close to main pattern from post-OPC (Optical Proximity Correction) gds by our desired rule and choose the patterns that distribute over whole mask uniformly. The convergence test shows 100 points measurement has a reliable result.
Overlay improvements using a real time machine learning algorithm
NASA Astrophysics Data System (ADS)
Schmitt-Weaver, Emil; Kubis, Michael; Henke, Wolfgang; Slotboom, Daan; Hoogenboom, Tom; Mulkens, Jan; Coogans, Martyn; ten Berge, Peter; Verkleij, Dick; van de Mast, Frank
2014-04-01
While semiconductor manufacturing is moving towards the 14nm node using immersion lithography, the overlay requirements are tightened to below 5nm. Next to improvements in the immersion scanner platform, enhancements in the overlay optimization and process control are needed to enable these low overlay numbers. Whereas conventional overlay control methods address wafer and lot variation autonomously with wafer pre exposure alignment metrology and post exposure overlay metrology, we see a need to reduce these variations by correlating more of the TWINSCAN system's sensor data directly to the post exposure YieldStar metrology in time. In this paper we will present the results of a study on applying a real time control algorithm based on machine learning technology. Machine learning methods use context and TWINSCAN system sensor data paired with post exposure YieldStar metrology to recognize generic behavior and train the control system to anticipate on this generic behavior. Specific for this study, the data concerns immersion scanner context, sensor data and on-wafer measured overlay data. By making the link between the scanner data and the wafer data we are able to establish a real time relationship. The result is an inline controller that accounts for small changes in scanner hardware performance in time while picking up subtle lot to lot and wafer to wafer deviations introduced by wafer processing.
Iowa task report : US 18 concrete overlay construction under traffic.
DOT National Transportation Integrated Search
2012-05-01
The National Concrete Pavement Technology Center, Iowa Department of Transportation, and Federal Highway Administration set out to demonstrate and document the design and construction of portland cement concrete (PCC) overlays on two-lane roadways wh...
Image-based overlay measurement using subsurface ultrasonic resonance force microscopy
NASA Astrophysics Data System (ADS)
Tamer, M. S.; van der Lans, M. J.; Sadeghian, H.
2018-03-01
Image Based Overlay (IBO) measurement is one of the most common techniques used in Integrated Circuit (IC) manufacturing to extract the overlay error values. The overlay error is measured using dedicated overlay targets which are optimized to increase the accuracy and the resolution, but these features are much larger than the IC feature size. IBO measurements are realized on the dedicated targets instead of product features, because the current overlay metrology solutions, mainly based on optics, cannot provide sufficient resolution on product features. However, considering the fact that the overlay error tolerance is approaching 2 nm, the overlay error measurement on product features becomes a need for the industry. For sub-nanometer resolution metrology, Scanning Probe Microscopy (SPM) is widely used, though at the cost of very low throughput. The semiconductor industry is interested in non-destructive imaging of buried structures under one or more layers for the application of overlay and wafer alignment, specifically through optically opaque media. Recently an SPM technique has been developed for imaging subsurface features which can be potentially considered as a solution for overlay metrology. In this paper we present the use of Subsurface Ultrasonic Resonance Force Microscopy (SSURFM) used for IBO measurement. We used SSURFM for imaging the most commonly used overlay targets on a silicon substrate and photoresist. As a proof of concept we have imaged surface and subsurface structures simultaneously. The surface and subsurface features of the overlay targets are fabricated with programmed overlay errors of +/-40 nm, +/-20 nm, and 0 nm. The top layer thickness changes between 30 nm and 80 nm. Using SSURFM the surface and subsurface features were successfully imaged and the overlay errors were extracted, via a rudimentary image processing algorithm. The measurement results are in agreement with the nominal values of the programmed overlay errors.
A study of swing-curve physics in diffraction-based overlay
NASA Astrophysics Data System (ADS)
Bhattacharyya, Kaustuve; den Boef, Arie; Storms, Greet; van Heijst, Joost; Noot, Marc; An, Kevin; Park, Noh-Kyoung; Jeon, Se-Ra; Oh, Nang-Lyeom; McNamara, Elliott; van de Mast, Frank; Oh, SeungHwa; Lee, Seung Yoon; Hwang, Chan; Lee, Kuntack
2016-03-01
With the increase of process complexity in advanced nodes, the requirements of process robustness in overlay metrology continues to tighten. Especially with the introduction of newer materials in the film-stack along with typical stack variations (thickness, optical properties, profile asymmetry etc.), the signal formation physics in diffraction-based overlay (DBO) becomes an important aspect to apply in overlay metrology target and recipe selection. In order to address the signal formation physics, an effort is made towards studying the swing-curve phenomena through wavelength and polarizations on production stacks using simulations as well as experimental technique using DBO. The results provide a wealth of information on target and recipe selection for robustness. Details from simulation and measurements will be reported in this technical publication.
NASA Astrophysics Data System (ADS)
Shahi, Amandeep S.; Pandey, Sunil
2008-02-01
Weld cladding is a process for producing surfaces with good corrosion resistant properties by means of depositing/laying of stainless steels on low-carbon steel components with an objective of achieving maximum economy and enhanced life. The aim of the work presented here was to investigate the effect of auxiliary preheating of the solid filler wire in mechanized gas metal arc welding (GMAW) process (by using a specially designed torch to preheat the filler wire independently, before its emergence from the torch) on the quality of the as-welded single layer stainless steel overlays. External preheating of the filler wire resulted in greater contribution of arc energy by resistive heating due to which significant drop in the main welding current values and hence low dilution levels were observed. Metallurgical aspects of the as welded overlays such as chemistry, ferrite content, and modes of solidification were studied to evaluate their suitability for service and it was found that claddings obtained through the preheating arrangement, besides higher ferrite content, possessed higher content of chromium, nickel, and molybdenum and lower content of carbon as compared to conventional GMAW claddings, thereby giving overlays with superior mechanical and corrosion resistance properties. The findings of this study not only establish the technical superiority of the new process, but also, owing to its productivity-enhanced features, justify its use for low-cost surfacing applications.
Shanks, Ryan A.; Robertson, Chuck L.; Haygood, Christian S.; Herdliksa, Anna M.; Herdliska, Heather R.; Lloyd, Steven A.
2017-01-01
Introductory biology courses provide an important opportunity to prepare students for future courses, yet existing cookbook labs, although important in their own way, fail to provide many of the advantages of semester-long research experiences. Engaging, authentic research experiences aid biology students in meeting many learning goals. Therefore, overlaying a research experience onto the existing lab structure allows faculty to overcome barriers involving curricular change. Here we propose a working model for this overlay design in an introductory biology course and detail a means to conduct this lab with minimal increases in student and faculty workloads. Furthermore, we conducted exploratory factor analysis of the Experimental Design Ability Test (EDAT) and uncovered two latent factors which provide valid means to assess this overlay model’s ability to increase advanced experimental design abilities. In a pre-test/post-test design, we demonstrate significant increases in both basic and advanced experimental design abilities in an experimental and comparison group. We measured significantly higher gains in advanced experimental design understanding in students in the experimental group. We believe this overlay model and EDAT factor analysis contribute a novel means to conduct and assess the effectiveness of authentic research experiences in an introductory course without major changes to the course curriculum and with minimal increases in faculty and student workloads. PMID:28904647
Assessment of asphalt interlayer designed on jointed concrete.
DOT National Transportation Integrated Search
2014-11-01
Reflective cracking in hot mix asphalt (HMA) overlays has been a common cause of poor pavement performance in Iowa for : many years. Reflective cracks commonly occur in HMA overlays when deteriorated portland cement concrete is paved over with : HMA....
Development of improved pavement rehabilitation procedures based on FWD backcalculation.
DOT National Transportation Integrated Search
2015-01-01
Hot Mix Asphalt (HMA) overlays are among the most effective maintenance and rehabilitation : alternatives in improving the structural as well as functional performance of flexible pavements. HMA : overlay design procedures can be based on: (1) engine...
SEM-based overlay measurement between via patterns and buried M1 patterns using high-voltage SEM
NASA Astrophysics Data System (ADS)
Hasumi, Kazuhisa; Inoue, Osamu; Okagawa, Yutaka; Shao, Chuanyu; Leray, Philippe; Halder, Sandip; Lorusso, Gian; Jehoul, Christiane
2017-03-01
The miniaturization of semiconductors continues, importance of overlay measurement is increasing. We measured overlay with analysis SEM called Miracle Eye which can output ultrahigh acceleration voltage in 1998. Meanwhile, since 2006, we have been working on SEM based overlay measurement and developed overlay measurement function of the same layer using CD-SEM. Then, we evaluated overlay of the same layer pattern after etching. This time, in order to measure overlay after lithography, we evaluated the see-through overlay using high voltage SEM CV5000 released in October 2016. In collaboration between imec and Hitachi High-Technologies, we evaluated repeatability, TIS of SEM-OVL as well as correlation between SEM-OVL and Opt-OVL in the M1@ADI and V0@ADI process. Repeatability and TIS results are reasonable and SEM-OVL has good correlation with Opt-OVL. By overlay measurement using CV 5000, we got the following conclusions. (1)SEM_OVL results of both M1 and V0 at ADI show good correlation to OPT_OVL. (2)High voltage SEM can prove the measurement capability of a small pattern(Less than 1 2um) like device that can be placed in-die area. (3)"In-die SEM based overlay" shows possibility for high order control of scanner
High Cycle Fatigue (HCF) Science and Technology Program 2002 Annual Report
2003-08-01
Turbine Engine Airfoils, Phase I 4.3 Probabilistic Design of Turbine Engine Airfoils, Phase II 4.4 Probabilistic Blade Design System 4.5...XTL17/SE2 7.4 Conclusion 8.0 TEST AND EVALUATION 8.1 Characterization Test Protocol 8.2 Demonstration Test Protocol 8.3 Development of Multi ...transparent and opaque overlays for processing. The objective of the SBIR Phase I program was to identify and evaluate promising methods for
Overlay accuracy on a flexible web with a roll printing process based on a roll-to-roll system.
Chang, Jaehyuk; Lee, Sunggun; Lee, Ki Beom; Lee, Seungjun; Cho, Young Tae; Seo, Jungwoo; Lee, Sukwon; Jo, Gugrae; Lee, Ki-yong; Kong, Hyang-Shik; Kwon, Sin
2015-05-01
For high-quality flexible devices from printing processes based on Roll-to-Roll (R2R) systems, overlay alignment during the patterning of each functional layer poses a major challenge. The reason is because flexible substrates have a relatively low stiffness compared with rigid substrates, and they are easily deformed during web handling in the R2R system. To achieve a high overlay accuracy for a flexible substrate, it is important not only to develop web handling modules (such as web guiding, tension control, winding, and unwinding) and a precise printing tool but also to control the synchronization of each unit in the total system. A R2R web handling system and reverse offset printing process were developed in this work, and an overlay between the 1st and 2nd layers of ±5μm on a 500 mm-wide film was achieved at a σ level of 2.4 and 2.8 (x and y directions, respectively) in a continuous R2R printing process. This paper presents the components and mechanisms used in reverse offset printing based on a R2R system and the printing results including positioning accuracy and overlay alignment accuracy.
Sintered electrode for solid oxide fuel cells
Ruka, Roswell J.; Warner, Kathryn A.
1999-01-01
A solid oxide fuel cell fuel electrode is produced by a sintering process. An underlayer is applied to the electrolyte of a solid oxide fuel cell in the form of a slurry, which is then dried. An overlayer is applied to the underlayer and then dried. The dried underlayer and overlayer are then sintered to form a fuel electrode. Both the underlayer and the overlayer comprise a combination of electrode metal such as nickel, and stabilized zirconia such as yttria-stabilized zirconia, with the overlayer comprising a greater percentage of electrode metal. The use of more stabilized zirconia in the underlayer provides good adhesion to the electrolyte of the fuel cell, while the use of more electrode metal in the overlayer provides good electrical conductivity. The sintered fuel electrode is less expensive to produce compared with conventional electrodes made by electrochemical vapor deposition processes. The sintered electrodes exhibit favorable performance characteristics, including good porosity, adhesion, electrical conductivity and freedom from degradation.
Sintered electrode for solid oxide fuel cells
Ruka, R.J.; Warner, K.A.
1999-06-01
A solid oxide fuel cell fuel electrode is produced by a sintering process. An underlayer is applied to the electrolyte of a solid oxide fuel cell in the form of a slurry, which is then dried. An overlayer is applied to the underlayer and then dried. The dried underlayer and overlayer are then sintered to form a fuel electrode. Both the underlayer and the overlayer comprise a combination of electrode metal such as nickel, and stabilized zirconia such as yttria-stabilized zirconia, with the overlayer comprising a greater percentage of electrode metal. The use of more stabilized zirconia in the underlayer provides good adhesion to the electrolyte of the fuel cell, while the use of more electrode metal in the overlayer provides good electrical conductivity. The sintered fuel electrode is less expensive to produce compared with conventional electrodes made by electrochemical vapor deposition processes. The sintered electrodes exhibit favorable performance characteristics, including good porosity, adhesion, electrical conductivity and freedom from degradation. 4 figs.
NASA Astrophysics Data System (ADS)
Bao, Yi; Valipour, Mahdi; Meng, Weina; Khayat, Kamal H.; Chen, Genda
2017-08-01
This study develops a delamination detection system for smart ultra-high-performance concrete (UHPC) overlays using a fully distributed fiber optic sensor. Three 450 mm (length) × 200 mm (width) × 25 mm (thickness) UHPC overlays were cast over an existing 200 mm thick concrete substrate. The initiation and propagation of delamination due to early-age shrinkage of the UHPC overlay were detected as sudden increases and their extension in spatial distribution of shrinkage-induced strains measured from the sensor based on pulse pre-pump Brillouin optical time domain analysis. The distributed sensor is demonstrated effective in detecting delamination openings from microns to hundreds of microns. A three-dimensional finite element model with experimental material properties is proposed to understand the complete delamination process measured from the distributed sensor. The model is validated using the distributed sensor data. The finite element model with cohesive elements for the overlay-substrate interface can predict the complete delamination process.
In-cell overlay metrology by using optical metrology tool
NASA Astrophysics Data System (ADS)
Lee, Honggoo; Han, Sangjun; Hong, Minhyung; Kim, Seungyoung; Lee, Jieun; Lee, DongYoung; Oh, Eungryong; Choi, Ahlin; Park, Hyowon; Liang, Waley; Choi, DongSub; Kim, Nakyoon; Lee, Jeongpyo; Pandev, Stilian; Jeon, Sanghuck; Robinson, John C.
2018-03-01
Overlay is one of the most critical process control steps of semiconductor manufacturing technology. A typical advanced scheme includes an overlay feedback loop based on after litho optical imaging overlay metrology on scribeline targets. The after litho control loop typically involves high frequency sampling: every lot or nearly every lot. An after etch overlay metrology step is often included, at a lower sampling frequency, in order to characterize and compensate for bias. The after etch metrology step often involves CD-SEM metrology, in this case in-cell and ondevice. This work explores an alternative approach using spectroscopic ellipsometry (SE) metrology and a machine learning analysis technique. Advanced 1x nm DRAM wafers were prepared, including both nominal (POR) wafers with mean overlay offsets, as well as DOE wafers with intentional across wafer overlay modulation. After litho metrology was measured using optical imaging metrology, as well as after etch metrology using both SE and CD-SEM for comparison. We investigate 2 types of machine learning techniques with SE data: model-less and model-based, showing excellent performance for after etch in-cell on-device overlay metrology.
NASA Astrophysics Data System (ADS)
Kulse, P.; Sasai, K.; Schulz, K.; Wietstruck, M.
2017-06-01
In the last decades the semiconductor technology has been driven by Moore's law leading to high performance CMOS technologies with feature sizes of less than 10 nm [1]. It has been pointed out that not only scaling but also the integration of novel components and technology modules into CMOS/BiCMOS technologies is becoming more attractive to realize smart and miniaturized systems [2]. Driven by new applications in the area of communication, health and automation, new components and technology modules such as BiCMOS embedded RF-MEMS, high-Q passives, Sibased microfluidics and InP-SiGe BiCMOS heterointegration have been demonstrated [3-6]. In contrast to standard VLSI processes fabricated on front side of the silicon wafer, these new technology modules require addition backside processing of the wafer; thus an accurate alignment between the front and backside of the wafer is mandatory. In previous work an advanced back to front side alignment technique and implementation into IHP's 0.25/0.13 μm high performance SiGe:C BiCMOS backside process module has been presented [7]. The developed technique enables a high resolution and accurate lithography on the backside of BiCMOS wafer for additional backside processing. In addition to the aforementioned back side process technologies, new applications like Through-Silicon Vias (TSV) for interposers and advanced substrate technologies for 3D heterogeneous integration demand not only single wafer fabrication but also processing of wafer stacks provided by temporary and permanent wafer bonding [8]. Therefore, the available overlay measurement techniques are not suitable if overlay and alignment marks are realized at the bonding interface of a wafer stack which consists of both a silicon device and a silicon carrier wafer. The former used EVG 40NT automated overlay measurement system, which use two opposite positioned microscopes inspecting simultaneous the wafer back and front side, is not capable measuring embedded overlay marks. In this work, the non-contact infrared alignment system of the Nikon i-line Stepper NSR-SF150 for both the alignment and the overlay determination of bonded wafer stacks with embedded alignment marks are used to achieve an accurate alignment between the different wafer sides. The embedded field image alignment (FIA) marks of the interface and the device wafer top layer are measured in a single measurement job. By taking the offsets between all different FIA's into account, after correcting the wafer rotation induced FIA position errors, hence an overlay for the stacked wafers can be determined. The developed approach has been validated by a standard back to front side application. The overlay was measured and determined using both, the EVG NT40 automated measurement system with special overlay marks and the measurement of the FIA marks of the front and back side layer. A comparison of both results shows mismatches in x and y translations smaller than 200 nm, which is relatively small compared to the overlay tolerances of +/-500 nm for the back to front side process. After the successful validation of the developed technique, special wafer stacks with FIA alignment marks in the bonding interface are fabricated. Due to the super IR light transparency of both doubled side polished wafers, the embedded FIA marks generate a stable and clear signal for accurate x and y wafer coordinate positioning. The FIA marks of the device wafer top layer were measured under standard condition in a developed photoresist mask without IR illumination. Following overlay calculation shows an overlay of less than 200 nm, which enables very accurate process condition for highly scaled TSV integration and advanced substrate integration into IHP's 0.25/0.13 μm SiGe:C BiCMOS technology. The presented method can be applied for both the standard back to front side process technologies and also new temporary and permanent wafer bonding applications.
Evaluation of design and construction issues of thin HMA overlays.
DOT National Transportation Integrated Search
2015-04-01
While the overall implementation of thin HMA overlays in Texas has been successful, some issues need to be addressed: : appropriate blending of SAC A and SAC B aggregate to ensure adequate skid resistance; best practices to achieve adequate bonding :...
Thin overlay guidelines : project selection, design, and construction.
DOT National Transportation Integrated Search
2015-04-01
Thin hot mix asphalt (HMA) overlays are : cost-effective, high-performance maintenance : treatments. They can be laid at 1.0 to 0.5 inches : thick and consist of quality aggregate and binder : materials. The costs are generally more (per ton) : than ...
DOT National Transportation Integrated Search
2014-05-01
The overall objective of this research study is to evaluate the structural performance and loadcarrying : capacity of bonded concrete overlay pavement structures through accelerated pavement : testing and document the experience of mix design and con...
Yield impact for wafer shape misregistration-based binning for overlay APC diagnostic enhancement
NASA Astrophysics Data System (ADS)
Jayez, David; Jock, Kevin; Zhou, Yue; Govindarajulu, Venugopal; Zhang, Zhen; Anis, Fatima; Tijiwa-Birk, Felipe; Agarwal, Shivam
2018-03-01
The importance of traditionally acceptable sources of variation has started to become more critical as semiconductor technologies continue to push into smaller technology nodes. New metrology techniques are needed to pursue the process uniformity requirements needed for controllable lithography. Process control for lithography has the advantage of being able to adjust for cross-wafer variability, but this requires that all processes are close in matching between process tools/chambers for each process. When this is not the case, the cumulative line variability creates identifiable groups of wafers1 . This cumulative shape based effect is described as impacting overlay measurements and alignment by creating misregistration of the overlay marks. It is necessary to understand what requirements might go into developing a high volume manufacturing approach which leverages this grouping methodology, the key inputs and outputs, and what can be extracted from such an approach. It will be shown that this line variability can be quantified into a loss of electrical yield primarily at the edge of the wafer and proposes a methodology for root cause identification and improvement. This paper will cover the concept of wafer shape based grouping as a diagnostic tool for overlay control and containment, the challenges in implementing this in a manufacturing setting, and the limitations of this approach. This will be accomplished by showing that there are identifiable wafer shape based signatures. These shape based wafer signatures will be shown to be correlated to overlay misregistration, primarily at the edge. It will also be shown that by adjusting for this wafer shape signal, improvements can be made to both overlay as well as electrical yield. These improvements show an increase in edge yield, and a reduction in yield variability.
Design and construction recommendations for thin overlays in Texas.
DOT National Transportation Integrated Search
2012-10-01
Thin HMA overlays, laid at 1.0 inch or thinner, are cost-effective surface maintenance options. The primary focus of this research was : to develop specifications for three such mixes: fine dense-graded mix (fine DGM), fine-graded stone matrix asphal...
1982-12-28
molecular beam-surface scattering, high pressure microreactor , heterogeneous catalysis. :116. AmTRAC? ’CAuI1ae 4111, 8ee 1 111 It oesey -1lP d ify by...Crystallography.. . ..... ....................... 4 11. Design and Construction of a High Pressure Catalvtic Microreactor ... microreactor has been designed and constructed. This micro- reactor will be a useful adjunct to the molecular beam machine since in the former overall
Design of ultra high performance concrete as an overlay in pavements and bridge decks.
DOT National Transportation Integrated Search
2014-08-01
The main objective of this research was to develop ultra-high performance concrete (UHPC) as a reliable, economic, low carbon foot : print and durable concrete overlay material that can offer shorter traffic closures due to faster construction. The U...
Visual supports for shared reading with young children: the effect of static overlay design.
Wood Jackson, Carla; Wahlquist, Jordan; Marquis, Cassandra
2011-06-01
This study examined the effects of two types of static overlay design (visual scene display and grid display) on 39 children's use of a speech-generating device during shared storybook reading with an adult. This pilot project included two groups: preschool children with typical communication skills (n = 26) and with complex communication needs (n = 13). All participants engaged in shared reading with two books using each visual layout on a speech-generating device (SGD). The children averaged a greater number of activations when presented with a grid display during introductory exploration and free play. There was a large effect of the static overlay design on the number of silent hits, evidencing more silent hits with visual scene displays. On average, the children demonstrated relatively few spontaneous activations of the speech-generating device while the adult was reading, regardless of overlay design. When responding to questions, children with communication needs appeared to perform better when using visual scene displays, but the effect of display condition on the accuracy of responses to wh-questions was not statistically significant. In response to an open ended question, children with communication disorders demonstrated more frequent activations of the SGD using a grid display than a visual scene. Suggestions for future research as well as potential implications for designing AAC systems for shared reading with young children are discussed.
Advanced diffraction-based overlay for double patterning
NASA Astrophysics Data System (ADS)
Li, Jie; Liu, Yongdong; Dasari, Prasad; Hu, Jiangtao; Smith, Nigel; Kritsun, Oleg; Volkman, Catherine
2010-03-01
Diffraction based overlay (DBO) technologies have been developed to address the tighter overlay control challenges as the dimensions of integrated circuit continue to shrink. Several studies published recently have demonstrated that the performance of DBO technologies has the potential to meet the overlay metrology budget for 22nm technology node. However, several hurdles must be cleared before DBO can be used in production. One of the major hurdles is that most DBO technologies require specially designed targets that consist of multiple measurement pads, which consume too much space and increase measurement time. A more advanced spectroscopic ellipsometry (SE) technology-Mueller Matrix SE (MM-SE) is developed to address the challenge. We use a double patterning sample to demonstrate the potential of MM-SE as a DBO candidate. Sample matrix (the matrix that describes the effects of the sample on the incident optical beam) obtained from MM-SE contains up to 16 elements. We show that the Mueller elements from the off-diagonal 2x2 blocks respond to overlay linearly and are zero when overlay errors are absent. This superior property enables empirical DBO (eDBO) using two pads per direction. Furthermore, the rich information in Mueller matrix and its direct response to overlay make it feasible to extract overlay errors from only one pad per direction using modeling approach (mDBO). We here present the Mueller overlay results using both eDBO and mDBO and compare the results with image-based overlay (IBO) and CD-SEM results. We also report the tool induced shifts (TIS) and dynamic repeatability.
0-6742 : evaluation of design and construction issues of thin HMA overlays.
DOT National Transportation Integrated Search
2014-08-01
Thin hot-mix asphalt (HMA) overlays, placed : between 1.25 to 0.5 inches, have quickly become : a go-to maintenance treatment in Texas. While : implementation around the state is proving : successful, a few issues needed to be addressed: : 1. The una...
Mode-converting coupler for silicon-on-sapphire devices
NASA Astrophysics Data System (ADS)
Zlatanovic, S.; Offord, B. W.; Owen, M.; Shimabukuro, R.; Jacobs, E. W.
2015-02-01
Silicon-on-sapphire devices are attractive for the mid-infrared optical applications up to 5 microns due to the low loss of both silicon and sapphire in this wavelength band. Designing efficient couplers for silicon-on-sapphire devices presents a challenge due to a highly confined mode in silicon and large values of refractive index of both silicon and sapphire. Here, we present design, fabrication, and measurements of a mode-converting coupler for silicon-on-sapphire waveguides. We utilize a mode converter layout that consists of a large waveguide that is overlays a silicon inverse tapered waveguide. While this geometry was previously utilized for silicon-on-oxide devices, the novelty is in using materials that are compatible with the silicon-on-sapphire platform. In the current coupler the overlaying waveguide is made of silicon nitride. Silicon nitride is the material of choice because of the large index of refraction and low absorption from near-infrared to mid-infrared. The couplers were fabricated using a 0.25 micron silicon-on-sapphire process. The measured coupling loss from tapered lensed silica fibers to the silicon was 4.8dB/coupler. We will describe some challenges in fabrication process and discuss ways to overcome them.
Multi-wavelength approach towards on-product overlay accuracy and robustness
NASA Astrophysics Data System (ADS)
Bhattacharyya, Kaustuve; Noot, Marc; Chang, Hammer; Liao, Sax; Chang, Ken; Gosali, Benny; Su, Eason; Wang, Cathy; den Boef, Arie; Fouquet, Christophe; Huang, Guo-Tsai; Chen, Kai-Hsiung; Cheng, Kevin; Lin, John
2018-03-01
Success of diffraction-based overlay (DBO) technique1,4,5 in the industry is not just for its good precision and low toolinduced shift, but also for the measurement accuracy2 and robustness that DBO can provide. Significant efforts are put in to capitalize on the potential that DBO has to address measurement accuracy and robustness. Introduction of many measurement wavelength choices (continuous wavelength) in DBO is one of the key new capabilities in this area. Along with the continuous choice of wavelengths, the algorithms (fueled by swing-curve physics) on how to use these wavelengths are of high importance for a robust recipe setup that can avoid the impact from process stack variations (symmetric as well as asymmetric). All these are discussed. Moreover, another aspect of boosting measurement accuracy and robustness is discussed that deploys the capability to combine overlay measurement data from multiple wavelength measurements. The goal is to provide a method to make overlay measurements immune from process stack variations and also to report health KPIs for every measurement. By combining measurements from multiple wavelengths, a final overlay measurement is generated. The results show a significant benefit in accuracy and robustness against process stack variation. These results are supported by both measurement data as well as simulation from many product stacks.
Hot cracking susceptibility of Alloy 52M weld overlays onto CF8 stainless steel
NASA Astrophysics Data System (ADS)
Chu, H. A.; Young, M. C.; Chu, H. C.; Tsay, L. W.; Chen, C.
2013-02-01
In this study, weld overlays of Alloy 52M (a nickel-based filler metal) onto CF8 stainless steel (SS) were performed using the gas tungsten arc welding process. Hot cracking in the weld overlays was observed particularly near the interfacial region of the Alloy 52M/CF8 weld overlay. In general, the hot cracks were most likely to occur at the sites with high dilution rates, e.g., at the weld start/end locations of a single pass or in the first and second passes in multi-pass overlays. The region near the weld interface between Alloy 52M and the CF8 SS had a higher hot cracking tendency than the other regions. It was found that the dilution rate and the formation of eutectic-type constituents (i.e., γ/NbC) both played significant roles in the determination of the hot cracking susceptibility of these weld overlays. Nevertheless, hot cracks were entirely eliminated by proper deposition of a SS buffer layer prior to overlaying with Alloy 52M.
ERIC Educational Resources Information Center
Solan, Harold A.
1990-01-01
The article reviews three studies (EC 600 064-066) evaluating the effectiveness of using Irlen tinted lenses or overlays with reading-disabled persons. It is concluded that carefully designed and controlled studies do not currently lend support to the Irlen hypothesis. (DB)
DOT National Transportation Integrated Search
2009-03-01
The thirteenth full-scale Accelerated Pavement Test (APT) experiment at the Civil Infrastructure Laboratory (CISL) : of Kansas State University aimed to determine the response and the failure mode of thin concrete overlays. Four : pavement structures...
DOT National Transportation Integrated Search
2000-10-01
This report reviews Manitoba's and Minnesota's Specific Pavement Studies (SPS-5) projects. The studies focus on investigating the performance of hot mix asphalt (HMA) overlays on HMA pavements and involve nine core test sections. The SPS-5 design var...
Diffraction-based overlay measurement on dedicated mark using rigorous modeling method
NASA Astrophysics Data System (ADS)
Lu, Hailiang; Wang, Fan; Zhang, Qingyun; Chen, Yonghui; Zhou, Chang
2012-03-01
Diffraction Based Overlay (DBO) is widely evaluated by numerous authors, results show DBO can provide better performance than Imaging Based Overlay (IBO). However, DBO has its own problems. As well known, Modeling based DBO (mDBO) faces challenges of low measurement sensitivity and crosstalk between various structure parameters, which may result in poor accuracy and precision. Meanwhile, main obstacle encountered by empirical DBO (eDBO) is that a few pads must be employed to gain sufficient information on overlay-induced diffraction signature variations, which consumes more wafer space and costs more measuring time. Also, eDBO may suffer from mark profile asymmetry caused by processes. In this paper, we propose an alternative DBO technology that employs a dedicated overlay mark and takes a rigorous modeling approach. This technology needs only two or three pads for each direction, which is economic and time saving. While overlay measurement error induced by mark profile asymmetry being reduced, this technology is expected to be as accurate and precise as scatterometry technologies.
Three projects using 4.75 mm. superpave HMA on Route1A, Route 2A, & Route 27.
DOT National Transportation Integrated Search
2012-04-01
In July & August, 2010, MaineDOT applied 4.75 mm. (5/8 inch) Superpave designed hot mix asphalt : overlays in three locations. These overlay projects were on Route 1A, 2A, and 27, located in Forkstown, : New Portland, and Limestone, respectively. Pro...
Three-dimensional reconstruction from serial sections in PC-Windows platform by using 3D_Viewer.
Xu, Yi-Hua; Lahvis, Garet; Edwards, Harlene; Pitot, Henry C
2004-11-01
Three-dimensional (3D) reconstruction from serial sections allows identification of objects of interest in 3D and clarifies the relationship among these objects. 3D_Viewer, developed in our laboratory for this purpose, has four major functions: image alignment, movie frame production, movie viewing, and shift-overlay image generation. Color images captured from serial sections were aligned; then the contours of objects of interest were highlighted in a semi-automatic manner. These 2D images were then automatically stacked at different viewing angles, and their composite images on a projected plane were recorded by an image transform-shift-overlay technique. These composition images are used in the object-rotation movie show. The design considerations of the program and the procedures used for 3D reconstruction from serial sections are described. This program, with a digital image-capture system, a semi-automatic contours highlight method, and an automatic image transform-shift-overlay technique, greatly speeds up the reconstruction process. Since images generated by 3D_Viewer are in a general graphic format, data sharing with others is easy. 3D_Viewer is written in MS Visual Basic 6, obtainable from our laboratory on request.
Evaluating diffraction-based overlay
NASA Astrophysics Data System (ADS)
Li, Jie; Tan, Asher; Jung, JinWoo; Goelzer, Gary; Smith, Nigel; Hu, Jiangtao; Ham, Boo-Hyun; Kwak, Min-Cheol; Kim, Cheol-Hong; Nam, Suk-Woo
2012-03-01
We evaluate diffraction-based overlay (DBO) metrology using two test wafers. The test wafers have different film stacks designed to test the quality of DBO data under a range of film conditions. We present DBO results using traditional empirical approach (eDBO). eDBO relies on linear response of the reflectance with respect to the overlay displacement within a small range. It requires specially designed targets that consist of multiple pads with programmed shifts. It offers convenience of quick recipe setup since there is no need to establish a model. We measure five DBO targets designed with different pitches and programmed shifts. The correlations of five eDBO targets and the correlation of eDBO to image-based overlay are excellent. The targets of 800nm and 600nm pitches have better dynamic precision than targets of 400nm pitch, which agrees with simulated results on signal/noise ratio. 3σ of less than 0.1nm is achieved for both wafers using the best configured targets. We further investigate the linearity assumption of eDBO algorithm. Simulation results indicate that as the pitch of DBO targets gets smaller, the nonlinearity error, i.e., the error in the overlay measurement results caused by deviation from ideal linear response, becomes bigger. We propose a nonlinearity correction (NLC) by including higher order terms in the optical response. The new algorithm with NLC improves measurement consistency for DBO targets of same pitch but different programmed shift, due to improved accuracy. The results from targets with different pitches, however, are improved marginally, indicating the presence of other error sources.
NASA Astrophysics Data System (ADS)
Bhattacharyya, Kaustuve; Ke, Chih-Ming; Huang, Guo-Tsai; Chen, Kai-Hsiung; Smilde, Henk-Jan H.; Fuchs, Andreas; Jak, Martin; van Schijndel, Mark; Bozkurt, Murat; van der Schaar, Maurits; Meyer, Steffen; Un, Miranda; Morgan, Stephen; Wu, Jon; Tsai, Vincent; Liang, Frida; den Boef, Arie; ten Berge, Peter; Kubis, Michael; Wang, Cathy; Fouquet, Christophe; Terng, L. G.; Hwang, David; Cheng, Kevin; Gau, TS; Ku, Y. C.
2013-04-01
Aggressive on-product overlay requirements in advanced nodes are setting a superior challenge for the semiconductor industry. This forces the industry to look beyond the traditional way-of-working and invest in several new technologies. Integrated metrology2, in-chip overlay control, advanced sampling and process correction-mechanism (using the highest order of correction possible with scanner interface today), are a few of such technologies considered in this publication.
NASA Astrophysics Data System (ADS)
Kim, Min-Suk; Won, Hwa-Yeon; Jeong, Jong-Mun; Böcker, Paul; Vergaij-Huizer, Lydia; Kupers, Michiel; Jovanović, Milenko; Sochal, Inez; Ryan, Kevin; Sun, Kyu-Tae; Lim, Young-Wan; Byun, Jin-Moo; Kim, Gwang-Gon; Suh, Jung-Joon
2016-03-01
In order to optimize yield in DRAM semiconductor manufacturing for 2x nodes and beyond, the (processing induced) overlay fingerprint towards the edge of the wafer needs to be reduced. Traditionally, this is achieved by acquiring denser overlay metrology at the edge of the wafer, to feed field-by-field corrections. Although field-by-field corrections can be effective in reducing localized overlay errors, the requirement for dense metrology to determine the corrections can become a limiting factor due to a significant increase of metrology time and cost. In this study, a more cost-effective solution has been found in extending the regular correction model with an edge-specific component. This new overlay correction model can be driven by an optimized, sparser sampling especially at the wafer edge area, and also allows for a reduction of noise propagation. Lithography correction potential has been maximized, with significantly less metrology needs. Evaluations have been performed, demonstrating the benefit of edge models in terms of on-product overlay performance, as well as cell based overlay performance based on metrology-to-cell matching improvements. Performance can be increased compared to POR modeling and sampling, which can contribute to (overlay based) yield improvement. Based on advanced modeling including edge components, metrology requirements have been optimized, enabling integrated metrology which drives down overall metrology fab footprint and lithography cycle time.
Active membrane masks for improved overlay performance in proximity lithography
NASA Astrophysics Data System (ADS)
Huston, Dryver R.; Plumpton, James; Esser, Brian; Sullivan, Gerald A.
2004-07-01
Membrane masks are thin (2 micron x 35 mm x 35 mm) structures that carry the master exposure patterns in proximity (X-ray) lithography. With the continuous drive to the printing of ever-finer features in microelectronics, the reduction of mask-wafer overlay positioning errors by passive rigid body positioning and passive stress control in the mask becomes impractical due to nano and sub-micron scale elastic deformations in the membrane mask. This paper describes the design, mechanics and performance of a system for actively stretching a membrane mask in-plane to control overlay distortion. The method uses thermoelectric heating/cooling elements placed on the mask perimeter. The thermoelectric elements cause controlled thermoelastic deformations in the supporting wafer, which in turn corrects distortions in the membrane mask. Silicon carbide masks are the focus of this study, but the method is believed to be applicable to other mask materials, such as diamond. Experimental and numerical results will be presented, as well as a discussion of the design issues and related design decisions.
NASA Astrophysics Data System (ADS)
Noyes, Ben F.; Mokaberi, Babak; Oh, Jong Hun; Kim, Hyun Sik; Sung, Jun Ha; Kea, Marc
2016-03-01
One of the keys to successful mass production of sub-20nm nodes in the semiconductor industry is the development of an overlay correction strategy that can meet specifications, reduce the number of layers that require dedicated chuck overlay, and minimize measurement time. Three important aspects of this strategy are: correction per exposure (CPE), integrated metrology (IM), and the prioritization of automated correction over manual subrecipes. The first and third aspects are accomplished through an APC system that uses measurements from production lots to generate CPE corrections that are dynamically applied to future lots. The drawback of this method is that production overlay sampling must be extremely high in order to provide the system with enough data to generate CPE. That drawback makes IM particularly difficult because of the throughput impact that can be created on expensive bottleneck photolithography process tools. The goal is to realize the cycle time and feedback benefits of IM coupled with the enhanced overlay correction capability of automated CPE without impacting process tool throughput. This paper will discuss the development of a system that sends measured data with reduced sampling via an optimized layout to the exposure tool's computational modelling platform to predict and create "upsampled" overlay data in a customizable output layout that is compatible with the fab user CPE APC system. The result is dynamic CPE without the burden of extensive measurement time, which leads to increased utilization of IM.
Influence of bitumen type on cracking resistance of asphalt mixtures used in pavement overlays
NASA Astrophysics Data System (ADS)
Jaskula, P.; Szydlowski, C.; Stienss, M.
2018-05-01
Cracking is one of the predominant distresses occurring in flexible pavements, especially in old pavements that were rehabilitated with an asphalt overlay. In such cases asphalt mixtures should be designed to ensure high resistance to reflective cracking because new asphalt layers are exposed to existing cracks of the old pavement. The nature of these cracks can be various (transverse, longitudinal as well as crazy cracking). One factor that minimizes this type of distress is the proper mix design process, which should involve selection of specific bitumen binder and mineral mix gradation. However, still there is no universally adopted laboratory test method that would allow to clearly assess resistance of asphalt mixtures to reflective cracking. This paper describes the usage of one of the devices developed to test asphalt mixtures in terms of such distress – Texas Overlay Tester. For this test, samples prepared in laboratory conditions (i.e. compacted with the use of Superpave Gyratory Compactor) as well as obtained in the field (by core drilling) can be used. The results are obtained not only quickly and easily, but also with sufficient repeatability. The described method characterizes both crack initiation and crack propagation properties of asphalt mixtures. In this work one type of mineral mixture was tested with 4 different types of bitumen (one neat bitumen, two ordinary polymer-modified and one polymer-modified with high polymer content). For selected cases extra additives (rubber and loose fibres) were also tested. In total, six asphalt mixtures were tested. A ranking of the used binders was created on the basis of the results in order to conclude which bitumen would ensure the best performance characteristics in terms of reflective cracking. The results have clearly shown that deliberate choice of the binder used in the asphalt mixture for the overlay will significantly improve its reflective cracking resistance or even fatigue resistance.
NASA Astrophysics Data System (ADS)
Analoui, Morteza; Rezvani, Mohammad Hossein
2011-01-01
Behavior modeling has recently been investigated for designing self-organizing mechanisms in the context of communication networks in order to exploit the natural selfishness of the users with the goal of maximizing the overall utility. In strategic behavior modeling, the users of the network are assumed to be game players who seek to maximize their utility with taking into account the decisions that the other players might make. The essential difference between the aforementioned researches and this work is that it incorporates the non-strategic decisions in order to design the mechanism for the overlay network. In this solution concept, the decisions that a peer might make does not affect the actions of the other peers at all. The theory of consumer-firm developed in microeconomics is a model of the non-strategic behavior that we have adopted in our research. Based on it, we have presented distributed algorithms for peers' "joining" and "leaving" operations. We have modeled the overlay network as a competitive economy in which the content provided by an origin server can be viewed as commodity and the origin server and the peers who multicast the content to their downside are considered as the firms. On the other hand, due to the dual role of the peers in the overlay network, they can be considered as the consumers as well. On joining to the overlay economy, each peer is provided with an income and tries to get hold of the service regardless to the behavior of the other peers. We have designed the scalable algorithms in such a way that the existence of equilibrium price (known as Walrasian equilibrium price) is guaranteed.
Bahillo, Jose; Jané, Luis; Bortolotto, Tissiana; Krejci, Ivo; Roig, Miguel
2014-10-01
Loss of tooth substance has become a common pathology in modern society. It is of multifactorial origin, may be induced by a chemical process or by excessive attrition, and frequently has a combined etiology. Particular care should be taken when diagnosing the cause of dental tissue loss, in order to minimize its impact. Several publications have proposed the use of minimally invasive procedures to treat such patients in preference to traditional full-crown rehabilitation. The use of composite resins, in combination with improvements in dental adhesion, allows a more conservative approach. In this paper, we describe the step-by-step procedure of full-mouth composite rehabilitation with v-shaped veneers and ultra-thin computer-aided design/computer-assisted manufacture (CAD/CAM)- generated composite overlays in a young patient with a combination of erosion and attrition disorder.
Better Ohmic Contacts For InP Semiconductor Devices
NASA Technical Reports Server (NTRS)
Weizer, Victor G.; Fatemi, Navid S.
1995-01-01
Four design modifications enable fabrication of improved ohmic contacts on InP-based semiconductor devices. First modification consists of insertion of layer of gold phosphide between n-doped InP and metal or other overlayer of contact material. Second, includes first modification plus use of particular metal overlayer to achieve very low contact resistivities. Third, also involves deposition of Au(2)P(3) interlayer; in addition, refractory metal (W or Ta) deposited to form contact overlayer. In fourth, contact layer of Auln alloy deposited directly on InP. Improved contacts exhibit low electrical resistances and fabricated without exposing devices to destructive predeposition or postdeposition treatments.
Lachance, Chantelle C; Korall, Alexandra M B; Russell, Colin M; Feldman, Fabio; Robinovitch, Stephen N; Mackey, Dawn C
2018-09-01
Purpose-designed compliant flooring and carpeting have been promoted as a means for reducing fall-related injuries in high-risk environments, such as long-term care. However, it is not known whether these surfaces influence the forces that long-term care staff exert when pushing residents in wheelchairs. We studied 14 direct-care staff who pushed a loaded wheelchair instrumented with a triaxial load cell to test the effects on hand force of flooring overlay (vinyl versus carpet) and flooring subfloor (concrete versus compliant rubber [brand: SmartCells]). During straight-line pushing, carpet overlay increased initial and sustained hand forces compared to vinyl overlay by 22-49% over a concrete subfloor and by 8-20% over a compliant subfloor. Compliant subflooring increased initial and sustained hand forces compared to concrete subflooring by 18-31% when under a vinyl overlay. In contrast, compliant flooring caused no change in initial or sustained hand forces compared to concrete subflooring when under a carpet overlay. Copyright © 2018 Elsevier Ltd. All rights reserved.
A study and simulation of the impact of high-order aberrations to overlay error distribution
NASA Astrophysics Data System (ADS)
Sun, G.; Wang, F.; Zhou, C.
2011-03-01
With reduction of design rules, a number of corresponding new technologies, such as i-HOPC, HOWA and DBO have been proposed and applied to eliminate overlay error. When these technologies are in use, any high-order error distribution needs to be clearly distinguished in order to remove the underlying causes. Lens aberrations are normally thought to mainly impact the Matching Machine Overlay (MMO). However, when using Image-Based overlay (IBO) measurement tools, aberrations become the dominant influence on single machine overlay (SMO) and even on stage repeatability performance. In this paper, several measurements of the error distributions of the lens of SMEE SSB600/10 prototype exposure tool are presented. Models that characterize the primary influence from lens magnification, high order distortion, coma aberration and telecentricity are shown. The contribution to stage repeatability (as measured with IBO tools) from the above errors was predicted with simulator and compared to experiments. Finally, the drift of every lens distortion that impact to SMO over several days was monitored and matched with the result of measurements.
Co-optimization of lithographic and patterning processes for improved EPE performance
NASA Astrophysics Data System (ADS)
Maslow, Mark J.; Timoshkov, Vadim; Kiers, Ton; Jee, Tae Kwon; de Loijer, Peter; Morikita, Shinya; Demand, Marc; Metz, Andrew W.; Okada, Soichiro; Kumar, Kaushik A.; Biesemans, Serge; Yaegashi, Hidetami; Di Lorenzo, Paolo; Bekaert, Joost P.; Mao, Ming; Beral, Christophe; Larivière, Stephane
2017-03-01
Complimentary lithography is already being used for advanced logic patterns. The tight pitches for 1D Metal layers are expected to be created using spacer based multiple patterning ArF-i exposures and the more complex cut/block patterns are made using EUV exposures. At the same time, control requirements of CDU, pattern shift and pitch-walk are approaching sub-nanometer levels to meet edge placement error (EPE) requirements. Local variability, such as Line Edge Roughness (LER), Local CDU, and Local Placement Error (LPE), are dominant factors in the total Edge Placement error budget. In the lithography process, improving the imaging contrast when printing the core pattern has been shown to improve the local variability. In the etch process, it has been shown that the fusion of atomic level etching and deposition can also improve these local variations. Co-optimization of lithography and etch processing is expected to further improve the performance over individual optimizations alone. To meet the scaling requirements and keep process complexity to a minimum, EUV is increasingly seen as the platform for delivering the exposures for both the grating and the cut/block patterns beyond N7. In this work, we evaluated the overlay and pattern fidelity of an EUV block printed in a negative tone resist on an ArF-i SAQP grating. High-order Overlay modeling and corrections during the exposure can reduce overlay error after development, a significant component of the total EPE. During etch, additional degrees of freedom are available to improve the pattern placement error in single layer processes. Process control of advanced pitch nanoscale-multi-patterning techniques as described above is exceedingly complicated in a high volume manufacturing environment. Incorporating potential patterning optimizations into both design and HVM controls for the lithography process is expected to bring a combined benefit over individual optimizations. In this work we will show the EPE performance improvement for a 32nm pitch SAQP + block patterned Metal 2 layer by cooptimizing the lithography and etch processes. Recommendations for further improvements and alternative processes will be given.
NASA Astrophysics Data System (ADS)
Park, Chul-Soon; Shrestha, Vivek Raj; Lee, Sang-Shin; Kim, Eun-Soo; Choi, Duk-Yong
2015-02-01
We present a highly efficient omnidirectional color filter that takes advantage of an Ag-TiO2-Ag nano-resonator integrated with a phase-compensating TiO2 overlay. The dielectric overlay substantially improves the angular sensitivity by appropriately compensating for the phase pertaining to the structure and suppresses unwanted optical reflection so as to elevate the transmission efficiency. The filter is thoroughly designed, and it is analyzed in terms of its reflection, optical admittance, and phase shift, thereby highlighting the origin of the omnidirectional resonance leading to angle-invariant characteristics. The polarization dependence of the filter is explored, specifically with respect to the incident angle, by performing experiments as well as by providing the relevant theoretical explanation. We could succeed in demonstrating the omnidirectional resonance for the incident angles ranging to up to 70°, over which the center wavelength is shifted by below 3.5% and the peak transmission efficiency is slightly degraded from 69%. The proposed filters incorporate a simple multi-layered structure and are expected to be utilized as tri-color pixels for applications that include image sensors and display devices. These devices are expected to allow good scalability, not requiring complex lithographic processes.
Wafer edge overlay control solution for N7 and beyond
NASA Astrophysics Data System (ADS)
van Haren, Richard; Calado, Victor; van Dijk, Leon; Hermans, Jan; Kumar, Kaushik; Yamashita, Fumiko
2018-03-01
Historically, the on-product overlay performance close to the wafer edge is lagging with respect to the inner part of the wafer. The reason for this is that wafer processing is less controlled close to the wafer edge as opposed to the rest of the wafer. It is generally accepted that Chemical Vapor Deposition (CVD) of stressed layers that cause wafer warp, wafer table contamination, Chemical Mechanical Polishing (CMP), and Reactive Ion Etch (RIE) may deteriorate the overlay performance and/or registration close to the wafer edge. For the N7 technology node and beyond, it is anticipated that the tight on-product overlay specification is required across the full wafer which includes the edge region. In this work, we highlight one contributor that may negatively impact the on-product overlay performance, namely the etch step. The focus will be mainly on the wafer edge region but the remaining part of the wafer is considered as well. Three use-cases are examined: multiple Litho-Etch steps (LEn), contact hole layer etch, and the copper dual damascene etch. We characterize the etch contribution by considering the overlay measurement after resist development inspect (ADI) and after etch inspect (AEI). We show that the Yieldstar diffraction based overlay (μDBO) measurements can be utilized to characterize the etch contribution to the overlay budget. The effects of target asymmetry as well as overlay shifts are considered and compared with SEM measurements. Based on the results above, we propose a control solution aiming to reduce or even eliminate the delta between ADI and AEI. By doing so, target/mark to device offsets due to etch might be avoided.
Nosouhian, Saeid; Davoudi, Amin; Derhami, Mohammad
2015-01-01
This clinical report describes prosthetic rehabilitation of posterior open bite relationship in a patient with several missing teeth and skeletal Class III malocclusion. Primary diagnostic esthetic evaluations were performed by mounting casts in centric relation and estimating lost vertical dimension of occlusion. Exclusive treatments were designated by applying overlay removable partial denture with external attachment systems for higher retentions. PMID:26929544
Nosouhian, Saeid; Davoudi, Amin; Derhami, Mohammad
2015-01-01
This clinical report describes prosthetic rehabilitation of posterior open bite relationship in a patient with several missing teeth and skeletal Class III malocclusion. Primary diagnostic esthetic evaluations were performed by mounting casts in centric relation and estimating lost vertical dimension of occlusion. Exclusive treatments were designated by applying overlay removable partial denture with external attachment systems for higher retentions.
Design and performance of a production-worthy excimer-laser-based stepper
NASA Astrophysics Data System (ADS)
Unger, Robert; Sparkes, Christopher; Disessa, Peter A.; Elliott, David J.
1992-06-01
Excimer-laser-based steppers have matured to a production-worthy state. Widefield high-NA lenses have been developed and characterized for imaging down to 0.35 micron and below. Excimer lasers have attained practical levels of performance capability and stability, reliability, safety, and operating cost. Excimer stepper system integration and control issues such as focus, exposure, and overlay stability have been addressed. Enabling support technologies -- resist systems, resist processing, metrology and conventional mask making -- continue to progress and are becoming available. This paper discusses specific excimer stepper design challenges, and presents characterization data from several field installations of XLSTM deep-UV steppers configured with an advanced lens design.
Machine learning for fab automated diagnostics
NASA Astrophysics Data System (ADS)
Giollo, Manuel; Lam, Auguste; Gkorou, Dimitra; Liu, Xing Lan; van Haren, Richard
2017-06-01
Process optimization depends largely on field engineer's knowledge and expertise. However, this practice turns out to be less sustainable due to the fab complexity which is continuously increasing in order to support the extreme miniaturization of Integrated Circuits. On the one hand, process optimization and root cause analysis of tools is necessary for a smooth fab operation. On the other hand, the growth in number of wafer processing steps is adding a considerable new source of noise which may have a significant impact at the nanometer scale. This paper explores the ability of historical process data and Machine Learning to support field engineers in production analysis and monitoring. We implement an automated workflow in order to analyze a large volume of information, and build a predictive model of overlay variation. The proposed workflow addresses significant problems that are typical in fab production, like missing measurements, small number of samples, confounding effects due to heterogeneity of data, and subpopulation effects. We evaluate the proposed workflow on a real usecase and we show that it is able to predict overlay excursions observed in Integrated Circuits manufacturing. The chosen design focuses on linear and interpretable models of the wafer history, which highlight the process steps that are causing defective products. This is a fundamental feature for diagnostics, as it supports process engineers in the continuous improvement of the production line.
Vafaei, Fariborz; Khoshhal, Masoumeh; Bayat-Movahed, Saeed; Ahangary, Ahmad Hassan; Firooz, Farnaz; Izady, Alireza; Rakhshan, Vahid
2011-08-01
Implant-retained mandibular ball-supported and bar-supported overlay dentures are the two most common treatment options for the edentulous mandible. The superior option in terms of strain distribution should be determined. The three-dimensional model of mandible (based on computerized tomography scan) and its overlying implant-retained bar-supported and ball-supported overlay dentures were simulated using SolidWorks, NURBS, and ANSYS Workbench. Loads A (60 N) and B (60 N) were exerted, respectively, in protrusive and laterotrusive motions, on second molar mesial, first molar mesial, and first premolar. The strain distribution patterns were assessed on (1) implant tissue, (2) first implant-bone, and (3) second implant-bone interfaces. Protrusive: Strain was mostly detected in the apical of the fixtures and least in the cervical when bar design was used. On the nonworking side, however, strain was higher in the cervical and lower in the apical compared with the working side implant. Laterotrusive: The strain values were closely similar in the two designs. It seems that both designs are acceptable in terms of stress distribution, although a superior pattern is associated with the application of bar design in protrusive motion.
Considerations for pattern placement error correction toward 5nm node
NASA Astrophysics Data System (ADS)
Yaegashi, Hidetami; Oyama, Kenichi; Hara, Arisa; Natori, Sakurako; Yamauchi, Shohei; Yamato, Masatoshi; Koike, Kyohei; Maslow, Mark John; Timoshkov, Vadim; Kiers, Ton; Di Lorenzo, Paolo; Fonseca, Carlos
2017-03-01
Multi-patterning has been adopted widely in high volume manufacturing as 193 immersion extension, and it becomes realistic solution of nano-order scaling. In fact, it must be key technology on single directional (1D) layout design [1] for logic devise and it becomes a major option for further scaling technique in SAQP. The requirement for patterning fidelity control is getting savior more and more, stochastic fluctuation as well as LER (Line edge roughness) has to be micro-scopic observation aria. In our previous work, such atomic order controllability was viable in complemented technique with etching and deposition [2]. Overlay issue form major potion in yield management, therefore, entire solution is needed keenly including alignment accuracy on scanner and detectability on overlay measurement instruments. As EPE (Edge placement error) was defined as the gap between design pattern and contouring of actual pattern edge, pattern registration in single process level must be considerable. The complementary patterning to fabricate 1D layout actually mitigates any process restrictions, however, multiple process step, symbolized as LELE with 193-i, is burden to yield management and affordability. Recent progress of EUV technology is remarkable, and it is major potential solution for such complicated technical issues. EUV has robust resolution limit and it must be definitely strong scaling driver for process simplification. On the other hand, its stochastic variation such like shot noise due to light source power must be resolved with any additional complemented technique. In this work, we examined the nano-order CD and profile control on EUV resist pattern and would introduce excellent accomplishments.
A nanometric Rh overlayer on a metal foil surface as a highly efficient three-way catalyst.
Misumi, Satoshi; Yoshida, Hiroshi; Hinokuma, Satoshi; Sato, Tetsuya; Machida, Masato
2016-07-08
Pulsed arc-plasma (AP) deposition of an Rh overlayer on an Fe-Cr-Al stainless steel foil produced a composite material that exhibited high activity for automotive three-way catalysis (TWC). The AP pulses deposited metallic Rh nanoparticles 1-3 nm in size, whose density on the surface increased with the number of pulses. This led to coalescence and grain growth on the foil surface and the eventual formation of a uniform two-dimensional Rh overlayer. Full coverage of the 51 μm-thick flat foil by a 3.2 nm-thick Rh overlayer was achieved after 1,000 pulses. A simulated TWC reaction using a miniature honeycomb fabricated using flat and corrugated foils with the Rh overlayers exhibited successful light-off at a practical gaseous hourly space velocity of 1.2 × 10(5) h(-1). The turnover frequency for the NO-CO reaction over the metallic honeycomb catalyst was ca. 80-fold greater than that achieved with a reference Rh/ZrO2-coated cordierite honeycomb prepared using a conventional wet impregnation and slurry coating procedure. Despite the nonporosity and low surface area of the foil-supported Rh overlayer compared with conventional powder catalysts (Rh/ZrO2), it is a promising alternative design for more efficient automotive catalysts that use less Rh loading.
Wirojanagud, Wanpen; Srisatit, Thares
2014-01-01
Fuzzy overlay approach on three raster maps including land slope, soil type, and distance to stream can be used to identify the most potential locations of high arsenic contamination in soils. Verification of high arsenic contamination was made by collection samples and analysis of arsenic content and interpolation surface by spatial anisotropic method. A total of 51 soil samples were collected at the potential contaminated location clarified by fuzzy overlay approach. At each location, soil samples were taken at the depth of 0.00-1.00 m from the surface ground level. Interpolation surface of the analysed arsenic content using spatial anisotropic would verify the potential arsenic contamination location obtained from fuzzy overlay outputs. Both outputs of the spatial surface anisotropic and the fuzzy overlay mapping were significantly spatially conformed. Three contaminated areas with arsenic concentrations of 7.19 ± 2.86, 6.60 ± 3.04, and 4.90 ± 2.67 mg/kg exceeded the arsenic content of 3.9 mg/kg, the maximum concentration level (MCL) for agricultural soils as designated by Office of National Environment Board of Thailand. It is concluded that fuzzy overlay mapping could be employed for identification of potential contamination area with the verification by surface anisotropic approach including intensive sampling and analysis of the substances of interest. PMID:25110751
Kim, Hui Taek; Ahn, Tae Young; Jang, Jae Hoon; Kim, Kang Hee; Lee, Sung Jae; Jung, Duk Young
2017-03-01
Three-dimensional (3D) computed tomography imaging is now being used to generate 3D models for planning orthopaedic surgery, but the process remains time consuming and expensive. For chronic radial head dislocation, we have designed a graphic overlay approach that employs selected 3D computer images and widely available software to simplify the process of osteotomy site selection. We studied 5 patients (2 traumatic and 3 congenital) with unilateral radial head dislocation. These patients were treated with surgery based on traditional radiographs, but they also had full sets of 3D CT imaging done both before and after their surgery: these 3D CT images form the basis for this study. From the 3D CT images, each patient generated 3 sets of 3D-printed bone models: 2 copies of the preoperative condition, and 1 copy of the postoperative condition. One set of the preoperative models was then actually osteotomized and fixed in the manner suggested by our graphic technique. Arcs of rotation of the 3 sets of 3D-printed bone models were then compared. Arcs of rotation of the 3 groups of bone models were significantly different, with the models osteotomized accordingly to our graphic technique having the widest arcs. For chronic radial head dislocation, our graphic overlay approach simplifies the selection of the osteotomy site(s). Three-dimensional-printed bone models suggest that this approach could improve range of motion of the forearm in actual surgical practice. Level IV-therapeutic study.
Advances in process overlay on 300-mm wafers
NASA Astrophysics Data System (ADS)
Staecker, Jens; Arendt, Stefanie; Schumacher, Karl; Mos, Evert C.; van Haren, Richard J. F.; van der Schaar, Maurits; Edart, Remi; Demmerle, Wolfgang; Tolsma, Hoite
2002-07-01
Overlay budgets are getting tighter within 300 mm volume production and as a consequence the process effects on alignment and off-line metrology becomes more important. In a short loop experiment, with cleared reference marks in each image field, the isolated effect of processing was measured with a sub-nanometer accuracy. The examined processes are Shallow Trench Isolation (STI), Tungsten-Chemical Mechanical Processing (W-CMP) and resist spinning. The alignment measurements were done on an ASML TWINSCANT scanner and the off-line metrology measurements on a KLA Tencor. Mark type and mark position dependency of the process effects are analyzed. The mean plus 3 (sigma) of the maximum overlay after correcting batch average wafer parameters is used as an overlay performance indicator (OPI). 3 (sigma) residuals to the wafer-model are used as an indicator of the noise that is added by the process. The results are in agreement with existing knowledge of process effects on 200 mm wafers. The W-CMP process introduces an additional wafer rotation and scaling that is similar for alignment marks and metrology targets. The effects depend on the mark type; in general they get less severe for higher spatial frequencies. For a 7th order alignment mark, the OPI measured about 12 nm and the added noise about 12 nm. For the examined metrology targets the OPI is about 20 nm with an added noise of about 90 nm. Two different types of alignment marks were tested in the STI process, i.e., zero layer marks and marks that were exposed together with the STI product. The overlay contribution due to processing on both types of alignment marks is very low (smaller than 5 nm OPI) and independent on mark type. Some flyers are observed fot the zero layer marks. The flyers can be explained by the residues of oxide and nitride that is left behind in the spaces of the alignment marks. Resist spinning is examined on single layer resist and resist with an organic Bottom Anti-Reflective Coating (BARC) underneath. Single layer resist showed scaling on unsegmented marks that disappears using higher diffraction orders and/or mark segmentation. Resist with a planarizing BARC caused additional effects on the wafer edge for measurements with the red laser signal. The effects disappear using the green laser of ATHENAT.
NASA Astrophysics Data System (ADS)
Kottman, Michael; Zhang, Shenjia; McGuffin-Cawley, James; Denney, Paul; Narayanan, Badri K.
2015-03-01
The laser hot wire process has gained considerable interest for additive manufacturing applications, leveraging its high deposition rate, low dilution, thermal stability, and general metallurgical control including the ability to introduce and preserve desired meta-stable phases. Recent advancements in closed-loop process control and laser technology have increased productivity, process stability, and control of deposit metallurgy. The laser hot wire process has shown success in several applications: repairing and rejuvenating casting dies, depositing a variety of alloys including abrasion wear-resistant overlays with solid and tubular wires, and producing low-dilution (<5%) nickel alloy overlays for corrosion applications. The feasibility of fabricating titanium buildups is being assessed for aerospace applications.
Robotic weld overlay coatings for erosion control
NASA Astrophysics Data System (ADS)
The erosion of materials by the impact of solid particles has received increasing attention during the past twenty years. Recently, research has been initiated with the event of advanced coal conversion processes in which erosion plays an important role. The resulting damage, termed Solid Particle Erosion (SPE), is of concern primarily because of the significantly increased operating costs which result in material failures. Reduced power plant efficiency due to solid particle erosion of boiler tubes and waterfalls has led to various methods to combat SPE. One method is to apply coatings to the components subjected to erosive environments. Protective weld overlay coatings are particularly advantageous in terms of coating quality. The weld overlay coatings are essentially immune to spallation due to a strong metallurgical bond with the substrate material. By using powder mixtures, multiple alloys can be mixed in order to achieve the best performance in an erosive environment. However, a review of the literature revealed a lack of information on weld overlay coating performance in erosive environments which makes the selection of weld overlay alloys a difficult task. The objective of this project is to determine the effects of weld overlay coating composition and microstructure on erosion resistance. These results will lead to a better understanding of erosion mitigation in CFB's.
NASA Astrophysics Data System (ADS)
Wu, Bin; Yin, Hongxi; Qin, Jie; Liu, Chang; Liu, Anliang; Shao, Qi; Xu, Xiaoguang
2016-09-01
Aiming at the increasing demand of the diversification services and flexible bandwidth allocation of the future access networks, a flexible passive optical network (PON) scheme combining time and wavelength division multiplexing (TWDM) with point-to-point wavelength division multiplexing (PtP WDM) overlay is proposed for the next-generation optical access networks in this paper. A novel software-defined optical distribution network (ODN) structure is designed based on wavelength selective switches (WSS), which can implement wavelength and bandwidth dynamical allocations and suits for the bursty traffic. The experimental results reveal that the TWDM-PON can provide 40 Gb/s downstream and 10 Gb/s upstream data transmission, while the PtP WDM-PON can support 10 GHz point-to-point dedicated bandwidth as the overlay complement system. The wavelengths of the TWDM-PON and PtP WDM-PON are allocated dynamically based on WSS, which verifies the feasibility of the proposed structure.
NASA Astrophysics Data System (ADS)
Mulkens, Jan; Kubis, Michael; Hinnen, Paul; de Graaf, Roelof; van der Laan, Hans; Padiy, Alexander; Menchtchikov, Boris
2013-04-01
Immersion lithography is being extended to the 20-nm and 14-nm node and the lithography performance requirements need to be tightened further to enable this shrink. In this paper we present an integral method to enable high-order fieldto- field corrections for both imaging and overlay, and we show that this method improves the performance with 20% - 50%. The lithography architecture we build for these higher order corrections connects the dynamic scanner actuators with the angle resolved scatterometer via a separate application server. Improvements of CD uniformity are based on enabling the use of freeform intra-field dose actuator and field-to-field control of focus. The feedback control loop uses CD and focus targets placed on the production mask. For the overlay metrology we use small in-die diffraction based overlay targets. Improvements of overlay are based on using the high order intra-field correction actuators on a field-tofield basis. We use this to reduce the machine matching error, extending the heating control and extending the correction capability for process induced errors.
DOE Office of Scientific and Technical Information (OSTI.GOV)
DuPont, J.N.; Banovic, S.W.; Marder, A.R.
1996-08-01
Low NOx burners are being installed in many fossil fired power plants in order to comply with new Clean Air Regulations. Due to the operating characteristics of these burners, boiler tube sulfidation corrosion is often enhanced and premature tube failures can occur. Failures due to oxidation and solid particle erosion are also a concern. A program was initiated in early 1996 to evaluate the use of iron aluminide weld overlays for erosion/corrosion protection of boiler tubes in Low NOx boilers. Composite iron/aluminum wires will be used with the Gas Metal Arc Welding (GMAW) process to prepare overlays on boiler tubesmore » steels with aluminum contents from 8 to 16wt%. The weldability of the composite wires will be evaluated as a function of chemical composition and welding parameters. The effect of overlay composition on corrosion (oxidation and sulfidation) and solid particle erosion will also be evaluated. The laboratory studies will be complemented by field exposures of both iron aluminide weld overlays and co-extruded tubing under actual boiler conditions.« less
NASA Technical Reports Server (NTRS)
Baumgardner, M. F. (Principal Investigator)
1973-01-01
The author has identified the following significant results. The most significant result was the use of the temporal overlay technique where the computer was used to overlay ERTS-1 data from three different dates (9 Oct., 14 Nov., 2 Dec.). The registration of MSS digital data from different dates was estimated to be accurate within one half resolution element. The temporal overlay capability provides a significant advance in machine-processing of MSS data. It is no longer essential to go through the tedious exercise of locating ground observation sites on the digital data from each ERTS-1 overpass. Once the address of a ground observation site has been located on a digital tape from any ERTS-1 overpass, the overlay technique can be used to locate the same address on a digital tape of MSS data from any other ERTS-1 pass over the same area. The temporal overlay technique also adds a valuable dimension for identifying and mapping changes in vegetation, water, and other dynamic surface features.
Codes That Support Smart Growth Development
Provides examples of local zoning codes that support smart growth development, categorized by: unified development code, form-based code, transit-oriented development, design guidelines, street design standards, and zoning overlay.
From SHG to mid-infrared SPDC generation in strained silicon waveguides
NASA Astrophysics Data System (ADS)
Castellan, Claudio; Trenti, Alessandro; Mancinelli, Mattia; Marchesini, Alessandro; Ghulinyan, Mher; Pucker, Georg; Pavesi, Lorenzo
2017-08-01
The centrosymmetric crystalline structure of Silicon inhibits second order nonlinear optical processes in this material. We report here that, by breaking the silicon symmetry with a stressing silicon nitride over-layer, Second Harmonic Generation (SHG) is obtained in suitably designed waveguides where multi-modal phase-matching is achieved. The modeling of the generated signal provides an effective strain-induced second order nonlinear coefficient of χ(2) = (0.30 +/- 0.02) pm/V. Our work opens also interesting perspectives on the reverse process, the Spontaneous Parametric Down Conversion (SPDC), through which it is possible to generate mid-infrared entangled photon pairs.
Automated strip-mine and reclamation mapping from ERTS
NASA Technical Reports Server (NTRS)
Rogers, R. H. (Principal Investigator); Reed, L. E.; Pettyjohn, W. A.
1974-01-01
The author has identified the following significant results. Computer processing techniques were applied to ERTS-1 computer-compatible tape (CCT) data acquired in August 1972 on the Ohio Power Company's coal mining operation in Muskingum County, Ohio. Processing results succeeded in automatically classifying, with an accuracy greater than 90%: (1) stripped earth and major sources of erosion; (2) partially reclaimed areas and minor sources of erosion; (3) water with sedimentation; (4) water without sedimentation; and (5) vegetation. Computer-generated tables listing the area in acres and square kilometers were produced for each target category. Processing results also included geometrically corrected map overlays, one for each target category, drawn on a transparent material by a pen under computer control. Each target category is assigned a distinctive color on the overlay to facilitate interpretation. The overlays, drawn at a scale of 1:250,000 when placed over an AMS map of the same area, immediately provided map locations for each target. These mapping products were generated at a tenth of the cost of conventional mapping techniques.
Processing method for forming dislocation-free SOI and other materials for semiconductor use
Holland, Orin Wayne; Thomas, Darrell Keith; Zhou, Dashun
1997-01-01
A method for preparing a silicon-on-insulator material having a relatively defect-free Si overlayer involves the implanting of oxygen ions within a silicon body and the interruption of the oxygen-implanting step to implant Si ions within the silicon body. The implanting of the oxygen ions develops an oxide layer beneath the surface of the silicon body, and the Si ions introduced by the Si ion-implanting step relieves strain which is developed in the Si overlayer during the implanting step without the need for any intervening annealing step. By relieving the strain in this manner, the likelihood of the formation of strain-induced defects in the Si overlayer is reduced. In addition, the method can be carried out at lower processing temperatures than have heretofore been used with SIMOX processes of the prior art. The principles of the invention can also be used to relieve negative strain which has been induced in a silicon body of relatively ordered lattice structure.
Maricic, Natalie; Dawid, Suzanne
2014-09-30
Streptococcus pneumoniae colonizes the highly diverse polymicrobial community of the nasopharynx where it must compete with resident organisms. We have shown that bacterially produced antimicrobial peptides (bacteriocins) dictate the outcome of these competitive interactions. All fully-sequenced pneumococcal strains harbor a bacteriocin-like peptide (blp) locus. The blp locus encodes for a range of diverse bacteriocins and all of the highly conserved components needed for their regulation, processing, and secretion. The diversity of the bacteriocins found in the bacteriocin immunity region (BIR) of the locus is a major contributor of pneumococcal competition. Along with the bacteriocins, immunity genes are found in the BIR and are needed to protect the producer cell from the effects of its own bacteriocin. The overlay assay is a quick method for examining a large number of strains for competitive interactions mediated by bacteriocins. The overlay assay also allows for the characterization of bacteriocin-specific immunity, and detection of secreted quorum sensing peptides. The assay is performed by pre-inoculating an agar plate with a strain to be tested for bacteriocin production followed by application of a soft agar overlay containing a strain to be tested for bacteriocin sensitivity. A zone of clearance surrounding the stab indicates that the overlay strain is sensitive to the bacteriocins produced by the pre-inoculated strain. If no zone of clearance is observed, either the overlay strain is immune to the bacteriocins being produced or the pre-inoculated strain does not produce bacteriocins. To determine if the blp locus is functional in a given strain, the overlay assay can be adapted to evaluate for peptide pheromone secretion by the pre-inoculated strain. In this case, a series of four lacZ-reporter strains with different pheromone specificity are used in the overlay.
A Hybrid P2P Overlay Network for Non-strictly Hierarchically Categorized Content
NASA Astrophysics Data System (ADS)
Wan, Yi; Asaka, Takuya; Takahashi, Tatsuro
In P2P content distribution systems, there are many cases in which the content can be classified into hierarchically organized categories. In this paper, we propose a hybrid overlay network design suitable for such content called Pastry/NSHCC (Pastry for Non-Strictly Hierarchically Categorized Content). The semantic information of classification hierarchies of the content can be utilized regardless of whether they are in a strict tree structure or not. By doing so, the search scope can be restrained to any granularity, and the number of query messages also decreases while maintaining keyword searching availability. Through simulation, we showed that the proposed method provides better performance and lower overhead than unstructured overlays exploiting the same semantic information.
On Adding Structure to Unstructured Overlay Networks
NASA Astrophysics Data System (ADS)
Leitão, João; Carvalho, Nuno A.; Pereira, José; Oliveira, Rui; Rodrigues, Luís
Unstructured peer-to-peer overlay networks are very resilient to churn and topology changes, while requiring little maintenance cost. Therefore, they are an infrastructure to build highly scalable large-scale services in dynamic networks. Typically, the overlay topology is defined by a peer sampling service that aims at maintaining, in each process, a random partial view of peers in the system. The resulting random unstructured topology is suboptimal when a specific performance metric is considered. On the other hand, structured approaches (for instance, a spanning tree) may optimize a given target performance metric but are highly fragile. In fact, the cost for maintaining structures with strong constraints may easily become prohibitive in highly dynamic networks. This chapter discusses different techniques that aim at combining the advantages of unstructured and structured networks. Namely we focus on two distinct approaches, one based on optimizing the overlay and another based on optimizing the gossip mechanism itself.
The future of EUV lithography: enabling Moore's Law in the next decade
NASA Astrophysics Data System (ADS)
Pirati, Alberto; van Schoot, Jan; Troost, Kars; van Ballegoij, Rob; Krabbendam, Peter; Stoeldraijer, Judon; Loopstra, Erik; Benschop, Jos; Finders, Jo; Meiling, Hans; van Setten, Eelco; Mika, Niclas; Dredonx, Jeannot; Stamm, Uwe; Kneer, Bernhard; Thuering, Bernd; Kaiser, Winfried; Heil, Tilmann; Migura, Sascha
2017-03-01
While EUV systems equipped with a 0.33 Numerical Aperture lenses are readying to start volume manufacturing, ASML and Zeiss are ramping up their development activities on a EUV exposure tool with Numerical Aperture greater than 0.5. The purpose of this scanner, targeting a resolution of 8nm, is to extend Moore's law throughout the next decade. A novel, anamorphic lens design, has been developed to provide the required Numerical Aperture; this lens will be paired with new, faster stages and more accurate sensors enabling Moore's law economical requirements, as well as the tight focus and overlay control needed for future process nodes. The tighter focus and overlay control budgets, as well as the anamorphic optics, will drive innovations in the imaging and OPC modelling, and possibly in the metrology concepts. Furthermore, advances in resist and mask technology will be required to image lithography features with less than 10nm resolution. This paper presents an overview of the key technology innovations and infrastructure requirements for the next generation EUV systems.
Immersion and dry scanner extensions for sub-10nm production nodes
NASA Astrophysics Data System (ADS)
Weichselbaum, Stefan; Bornebroek, Frank; de Kort, Toine; Droste, Richard; de Graaf, Roelof F.; van Ballegoij, Rob; Botter, Herman; McLaren, Matthew G.; de Boeij, Wim P.
2015-03-01
Progressing towards the 10nm and 7nm imaging node, pattern-placement and layer-to-layer overlay requirements keep on scaling down and drives system improvements in immersion (ArFi) and dry (ArF/KrF) scanners. A series of module enhancements in the NXT platform have been introduced; among others, the scanner is equipped with exposure stages with better dynamics and thermal control. Grid accuracy improvements with respect to calibration, setup, stability, and layout dependency tighten MMO performance and enable mix and match scanner operation. The same platform improvements also benefit focus control. Improvements in detectability and reproducibility of low contrast alignment marks enhance the alignment solution window for 10nm logic processes and beyond. The system's architecture allows dynamic use of high-order scanner optimization based on advanced actuators of projection lens and scanning stages. This enables a holistic optimization approach for the scanner, the mask, and the patterning process. Productivity scanner design modifications esp. stage speeds and optimization in metrology schemes provide lower layer costs for customers using immersion lithography as well as conventional dry technology. Imaging, overlay, focus, and productivity data is presented, that demonstrates 10nm and 7nm node litho-capability for both (immersion & dry) platforms.
NASA Astrophysics Data System (ADS)
Pop, Florin; Dobre, Ciprian; Mocanu, Bogdan-Costel; Citoteanu, Oana-Maria; Xhafa, Fatos
2016-11-01
Managing the large dimensions of data processed in distributed systems that are formed by datacentres and mobile devices has become a challenging issue with an important impact on the end-user. Therefore, the management process of such systems can be achieved efficiently by using uniform overlay networks, interconnected through secure and efficient routing protocols. The aim of this article is to advance our previous work with a novel trust model based on a reputation metric that actively uses the social links between users and the model of interaction between them. We present and evaluate an adaptive model for the trust management in structured overlay networks, based on a Mobile Cloud architecture and considering a honeycomb overlay. Such a model can be useful for supporting advanced mobile market-share e-Commerce platforms, where users collaborate and exchange reliable information about, for example, products of interest and supporting ad-hoc business campaigns
Advanced applications of scatterometry based optical metrology
NASA Astrophysics Data System (ADS)
Dixit, Dhairya; Keller, Nick; Kagalwala, Taher; Recchia, Fiona; Lifshitz, Yevgeny; Elia, Alexander; Todi, Vinit; Fronheiser, Jody; Vaid, Alok
2017-03-01
The semiconductor industry continues to drive patterning solutions that enable devices with higher memory storage capacity, faster computing performance, and lower cost per transistor. These developments in the field of semiconductor manufacturing along with the overall minimization of the size of transistors require continuous development of metrology tools used for characterization of these complex 3D device architectures. Optical scatterometry or optical critical dimension (OCD) is one of the most prevalent inline metrology techniques in semiconductor manufacturing because it is a quick, precise and non-destructive metrology technique. However, at present OCD is predominantly used to measure the feature dimensions such as line-width, height, side-wall angle, etc. of the patterned nano structures. Use of optical scatterometry for characterizing defects such as pitch-walking, overlay, line edge roughness, etc. is fairly limited. Inspection of process induced abnormalities is a fundamental part of process yield improvement. It provides process engineers with important information about process errors, and consequently helps optimize materials and process parameters. Scatterometry is an averaging technique and extending it to measure the position of local process induced defectivity and feature-to-feature variation is extremely challenging. This report is an overview of applications and benefits of using optical scatterometry for characterizing defects such as pitch-walking, overlay and fin bending for advanced technology nodes beyond 7nm. Currently, the optical scatterometry is based on conventional spectroscopic ellipsometry and spectroscopic reflectometry measurements, but generalized ellipsometry or Mueller matrix spectroscopic ellipsometry data provides important, additional information about complex structures that exhibit anisotropy and depolarization effects. In addition the symmetry-antisymmetry properties associated with Mueller matrix (MM) elements provide an excellent means of measuring asymmetry present in the structure. The useful additional information as well as symmetry-antisymmetry properties of MM elements is used to characterize fin bending, overlay defects and design improvements in the OCD test structures are used to boost OCDs' sensitivity to pitch-walking. In addition, the validity of the OCD based results is established by comparing the results to the top down critical dimensionscanning electron microscope (CD-SEM) and cross-sectional transmission electron microscope (TEM) images.
Texas flexible pavements overlays : review and analysis of existing databases.
DOT National Transportation Integrated Search
2011-12-01
Proper calibration of pavement design and rehabilitation performance models to : conditions in Texas is essential for cost-effective flexible pavement design. The degree of : excellence with which TxDOTs pavement design models is calibrated will d...
ERIC Educational Resources Information Center
Faraci, Marie Elaine
2009-01-01
The problem. The purpose of this study was to examine the effect of the Irlen[R] method's use of colored overlays on the reading achievement of 3rd-grade students who were identified as having Scotopic Sensitivity Syndrome/Irlen[R] Syndrome. Method. This was a true experimental, pre-test, post-test design. The Irlen[R] overlay, either present…
75 FR 13340 - Notice of Passenger Facility Charge (PFC) Approvals and Disapprovals
Federal Register 2010, 2011, 2012, 2013, 2014
2010-03-19
...--design and construction. Terminal facility improvements--design and construction. Runway pavement overlay... Collection at CHS and Use at CHS: Upgrade police radio communications. Design flight/baggage information... expansion--design. Standardize airfield signage. Restripe airfield taxiway and ramp edge. Improve airport...
Status of downstream fish passage at hydroelectric projects in the northeast, USA
Odeh, Mufeed; Orvis, Curtis
1997-01-01
In the northeastern United States several guidance, protection, and conveyance methods have been employed to assist downstream migrating fish. Overlay racks, standard bar racks with close spacing, louvers, curtain walls, guide walls, netting, and other means have been used to guide and protect fish from entrainment. The design process of these facilities comprises consideration of various factors, including flow approach, attraction flow, guidance and protection devices, bypass location, conveyance mechanism, and plunge pool conditions. This paper presents the status of the design criteria for downstream fish passage facilities at hydroelectric sites in the northeast part of the United States. Examples of existing facilities are given.
NASA Astrophysics Data System (ADS)
Zhang, Xiaoxiao; Snow, Patrick W.; Vaid, Alok; Solecky, Eric; Zhou, Hua; Ge, Zhenhua; Yasharzade, Shay; Shoval, Ori; Adan, Ofer; Schwarzband, Ishai; Bar-Zvi, Maayan
2015-03-01
Traditional metrology solutions are facing a range of challenges at the 1X node such as three dimensional (3D) measurement capabilities, shrinking overlay and critical dimension (CD) error budgets driven by multi-patterning and via in trench CD measurements. Hybrid metrology offers promising new capabilities to address some of these challenges but it will take some time before fully realized. This paper explores new capabilities currently offered on the in-line Critical Dimension Scanning Electron Microscope (CD-SEM) to address these challenges and enable the CD-SEM to move beyond measuring bottom CD using top down imaging. Device performance is strongly correlated with Fin geometry causing an urgent need for 3D measurements. New beam tilting capabilities enhance the ability to make 3D measurements in the front-end-of-line (FEOL) of the metal gate FinFET process in manufacturing. We explore these new capabilities for measuring Fin height and build upon the work communicated last year at SPIE1. Furthermore, we extend the application of the tilt beam to the back-end-of-line (BEOL) trench depth measurement and demonstrate its capability in production targeting replacement of the existing Atomic Force Microscope (AFM) measurements by including the height measurement in the existing CDSEM recipe to reduce fab cycle time. In the BEOL, another increasingly challenging measurement for the traditional CD-SEM is the bottom CD of the self-aligned via (SAV) in a trench first via last (TFVL) process. Due to the extremely high aspect ratio of the structure secondary electron (SE) collection from the via bottom is significantly reduced requiring the use of backscatter electrons (BSE) to increase the relevant image quality. Even with this solution, the resulting images are difficult to measure with advanced technology nodes. We explore new methods to increase measurement robustness and combine this with novel segmentation-based measurement algorithm generated specifically for BSE images. The results will be contrasted with data from previously used methods to quantify the improvement. We also compare the results to electrical test data to evaluate and quantify the measurement performance improvements. Lastly, according to International Technology Roadmap for Semiconductors (ITRS) from 2013, the overlay 3 sigma requirement will be 3.3 nm in 2015 and 2.9 nm in 2016. Advanced lithography requires overlay measurement in die on features resembling the device geometry. However, current optical overlay measurement is performed in the scribe line on large targets due to optical diffraction limit. In some cases, this limits the usefulness of the measurement since it does not represent the true behavior of the device. We explore using high voltage imaging to help address this urgent need. Novel CD-SEM based overlay targets that optimize the restrictions of process geometry and SEM technique were designed and spread out across the die. Measurements are done on these new targets both after photolithography and etch. Correlation is drawn between the two measurements. These results will also be compared to conventional optical overlay measurement approaches and we will discuss the possibility of using this capability in high volume manufacturing.
I-line stepper based overlay evaluation method for wafer bonding applications
NASA Astrophysics Data System (ADS)
Kulse, P.; Sasai, K.; Schulz, K.; Wietstruck, M.
2018-03-01
In the last decades the semiconductor technology has been driven by Moore's law leading to high performance CMOS technologies with feature sizes of less than 10 nm [1]. It has been pointed out that not only scaling but also the integration of novel components and technology modules into CMOS/BiCMOS technologies is becoming more attractive to realize smart and miniaturized systems [2]. Driven by new applications in the area of communication, health and automation, new components and technology modules such as BiCMOS embedded RF-MEMS, high-Q passives, Sibased microfluidics and InP-SiGe BiCMOS heterointegration have been demonstrated [3-6]. In contrast to standard VLSI processes fabricated on front side of the silicon wafer, these new technology modules additionally require to process the backside of the wafer; thus require an accurate alignment between the front and backside of the wafer. In previous work an advanced back to front side alignment technique and implementation into IHP's 0.25/0.13 µm high performance SiGe:C BiCMOS backside process module has been presented [7]. The developed technique enables a high resolution and accurate lithography on the backside of BiCMOS wafer for additional backside processing. In addition to the aforementioned back side process technologies, new applications like Through-Silicon Vias (TSV) for interposers and advanced substrate technologies for 3D heterogeneous integration demand not only single wafer fabrication but also processing of wafer stacks provided by temporary and permanent wafer bonding [8-9]. In this work, the non-contact infrared alignment system of the Nikon® i-line Stepper NSR-SF150 for both alignment and the overlay determination of bonded wafer stacks with embedded alignment marks are used to achieve an accurate alignment between the different wafer sides. The embedded field image alignment (FIA) marks of the interface and the device wafer top layer are measured in a single measurement job. By taking the offsets between all different FIA's into account, after correcting the wafer rotation induced FIA position errors, hence an overlay for the stacked wafers can be determined. The developed approach has been validated by a standard front side resist in resist experiment. After the successful validation of the developed technique, special wafer stacks with FIA alignment marks in the bonding interface are fabricated and exposed. Following overlay calculation shows an overlay of less than 200 nm, which enables very accurate process condition for highly scaled TSV integration and advanced substrate integration into IHP's 0.25/0.13 µm SiGe:C BiCMOS technology. The developed technique also allows using significantly smaller alignment marks (i.e. standard FIA alignment marks). Furthermore, the presented method is used, in case of wafer bow related overlay tool problems, for the overlay evaluation of the last two metal layers from production wafers prepared in IHP's standard 0.25/0.13 µm SiGe:C BiCMOS technology. In conclusion, the exposure and measurement job can be done with the same tool, minimizing the back to front side/interface top layer misalignment which leads to a significant device performance improvement of backside/TSV integrated components and technologies.
Flutter Analysis of the Shuttle Tile Overlay Repair Concept
NASA Technical Reports Server (NTRS)
Bey, Kim S.; Scott, Robert C.; Bartels, Robert E.; Waters, William A.; Chen, Roger
2007-01-01
The Space Shuttle tile overlay repair concept, developed at the NASA Johnson Space Center, is designed for on-orbit installation over an area of damaged tile to permit safe re-entry. The thin flexible plate is placed over the damaged area and secured to tile at discreet points around its perimeter. A series of flutter analyses were performed to determine if the onset of flutter met the required safety margins. Normal vibration modes of the panel, obtained from a simplified structural analysis of the installed concept, were combined with a series of aerodynamic analyses of increasing levels of fidelity in terms of modeling the flow physics to determine the onset of flutter. Results from these analyses indicate that it is unlikely that the overlay installed at body point 1800 will flutter during re-entry.
NASA Astrophysics Data System (ADS)
Kandel, Daniel; Levinski, Vladimir; Sapiens, Noam; Cohen, Guy; Amit, Eran; Klein, Dana; Vakshtein, Irina
2012-03-01
Currently, the performance of overlay metrology is evaluated mainly based on random error contributions such as precision and TIS variability. With the expected shrinkage of the overlay metrology budget to < 0.5nm, it becomes crucial to include also systematic error contributions which affect the accuracy of the metrology. Here we discuss fundamental aspects of overlay accuracy and a methodology to improve accuracy significantly. We identify overlay mark imperfections and their interaction with the metrology technology, as the main source of overlay inaccuracy. The most important type of mark imperfection is mark asymmetry. Overlay mark asymmetry leads to a geometrical ambiguity in the definition of overlay, which can be ~1nm or less. It is shown theoretically and in simulations that the metrology may enhance the effect of overlay mark asymmetry significantly and lead to metrology inaccuracy ~10nm, much larger than the geometrical ambiguity. The analysis is carried out for two different overlay metrology technologies: Imaging overlay and DBO (1st order diffraction based overlay). It is demonstrated that the sensitivity of DBO to overlay mark asymmetry is larger than the sensitivity of imaging overlay. Finally, we show that a recently developed measurement quality metric serves as a valuable tool for improving overlay metrology accuracy. Simulation results demonstrate that the accuracy of imaging overlay can be improved significantly by recipe setup optimized using the quality metric. We conclude that imaging overlay metrology, complemented by appropriate use of measurement quality metric, results in optimal overlay accuracy.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Arevalo, Ryan Lacdao; Escaño, Mary Clare Sison; Kasai, Hideaki, E-mail: kasai@dyn.ap.eng.osaka-u.ac.jp
2015-03-15
Catalytic oxidation of NO to NO{sub 2} is a significant research interest for improving the quality of air through exhaust gas purification systems. In this paper, the authors studied this reaction on pure Pt and Pt overlayer on 3d transition metals using kinetic Monte Carlo simulations coupled with density functional theory based first principles calculations. The authors found that on the Pt(111) surface, NO oxidation proceeds via the Eley–Rideal mechanism, with O{sub 2} dissociative adsorption as the rate-determining step. The oxidation path via the Langmuir–Hinshelwood mechanism is very slow and does not significantly contribute to the overall reaction. However, inmore » the Pt overlayer systems, the oxidation of NO on the surface is more thermodynamically and kinetically favorable compared to pure Pt. These findings are attributed to the weaker binding of O and NO on the Pt overlayer systems and the binding configuration of NO{sub 2} that promotes easier N-O bond formation. These results present insights for designing affordable and efficient catalysts for NO oxidation.« less
2016-09-27
contact regions and epitaxial capping layer are fabricated to investigate the advantages of both approaches. Devices were fabricated with various... Contacts 7 2.5 Packaging 11 3. Conclusions 12 4. References 13 Appendix. Detailed Fabrication Process 15 List of Symbols, Abbreviations, and...regions in violet (overlaying previous patterns) .......7 Fig. 6 Mask 4: intrinsic device contact window regions in orange (overlaying previous
NASA Technical Reports Server (NTRS)
Hoffer, R. M. (Principal Investigator)
1975-01-01
The author has reported the following significant results. A data set containing SKYLAB, LANDSAT, and topographic data has been overlayed, registered, and geometrically corrected to a scale of 1:24,000. After geometrically correcting both sets of data, the SKYLAB data were overlayed on the LANDSAT data. Digital topographic data were then obtained, reformatted, and a data channel containing elevation information was then digitally overlayed onto the LANDSAT and SKYLAB spectral data. The 14,039 square kilometers involving 2,113, 776 LANDSAT pixels represents a relatively large data set available for digital analysis. The overlayed data set enables investigators to numerically analyze and compare two sources of spectral data and topographic data from any point in the scene. This capability is new and it will permit a numerical comparison of spectral response with elevation, slope, and aspect. Utilization of the spectral and topographic data together to obtain more accurate classifications of the various cover types present is feasible.
Texas flexible pavements and overlays : year 5 report - complete data documentation.
DOT National Transportation Integrated Search
2017-05-01
Proper calibration and validation of pavement design and performance models to Texas conditions is : essential for cost-effective flexible pavement design, performance predictions, and maintenance/rehab : strategies. The veracity of the calibration o...
Flexible pavement rehabilitation manual. Rev., June 2001
DOT National Transportation Integrated Search
2001-06-01
This manual delineates the basic design strategies of the 1979 "Asphalt Concrete Overlay Design Manual" plus the many changes in procedures, and incorporates the use of new strategies and materials presently being used by Caltrans. Environmental conc...
Study for new hardmask process scheme
NASA Astrophysics Data System (ADS)
Lee, Daeyoup; Tatti, Phillip; Lee, Richard; Chang, Jack; Cho, Winston; Bae, Sanggil
2017-03-01
Hardmask processes are a key technique to enable low-k semiconductors, but they can have an impact on patterning control, influencing defectivity, alignment, and overlay. Specifically, amorphous carbon layer (ACL) hardmask schemes can negatively affect overlay by creating distorted alignment signals. A new scheme needs to be developed that can be inserted where amorphous carbon is used but provide better alignment performance. Typical spin-on carbon (SOC) materials used in other hardmask schemes have issues with DCD-FCD skew. In this paper we will evaluate new spin-on carbon material with a higher carbon content that could be a candidate to replace amorphous carbon.
Evaluation of the Cargill SafeLane surface overlay.
DOT National Transportation Integrated Search
2009-01-01
A recent development in polymer concrete overlays is the Cargill SafeLane surface overlay (SafeLane overlay). The 3/8-in-thick overlay is constructed with epoxy and broadcast aggregates, as are typical multiple-layer epoxy overlays that are used to p...
Veneziani, Marco
The aim of this article is to identify the indications for adhesively cemented restorations and to provide a correct step-by-step protocol for clinicians. New cavity preparation principles are based on morphological considerations in terms of geometry (maximum profile line and inclination of cusp lines), and structure (dentin concavity and enamel convexity). In this article, we discuss previous preparation concepts that were not designed purely for adhesive restorations and were therefore not conservative enough or suitable for adhesive procedures. The novel cavity shape consists of continuous inclined plane cavity margins (hollow chamfer or concave bevel) on axial walls, whenever they are coronal to the equatorial tooth line. A 1.2 mm-thick butt-joint preparation is performed in the interproximal box and on the axial walls when the margins are apical to the equatorial line. The occlusal surface is anatomically prepared, free of slots and angles. The author's suggestion is to avoid shoulder finish line preparation around cusps, occlusal slots, and pins, as they are less conservative, incompatible with adhesive procedures, and involve unnecessary dentin exposure. The clinical advantages of this new "anatomic" preparation design are 1) improving adhesion quality (optimizing the cutting of enamel prisms, and increasing the available enamel surface); 2) minimizing dentin exposure; 3) maximizing hard tissue preservation (the cavity being designed for cementation with reinforced composite resins, improvement of flow, and removal of excess material); 4) optimization of esthetic integration due to the inclined plane design, which permits a better blending at the transition area between tooth and restoration. These preparation principles may be effectively used for all adhesively cemented restorations, both according to traditional concepts (inlay, onlay, overlay) and new ones (additional overlay, occlusal-veneer, overlay-veneer, long-wrap overlay, adhesive crown). Thus, a balance between restoration and prosthodontics is created, which is characterized by a more conservative approach.
Interface effects in ultra-thin films: Magnetic and chemical properties
NASA Astrophysics Data System (ADS)
Park, Sungkyun
When the thickness of a magnetic layer is comparable to (or smaller than) the electron mean free path, the interface between magnetic and non-magnetic layers becomes very important factor to determine magnetic properties of the ultra-thin films. The quality of interface can enhance (or reduce) the desired properties. Several interesting physical phenomena were studied using these interface effects. The magnetic anisotropy of ultra-thin Co films is studied as function of non-magnetic underlayer thickness and non- magnetic overlayer materials using ex situ Brillouin light scattering (BLS). I observed that perpendicular magnetic anisotropy (PMA) increases with underlayer thickness and saturates after 5 ML. This saturation can be understood as a relaxation of the in-plane lattice parameter of Au(111) on top of Cu(111) to its bulk value. For the overlayer study, Cu, Al, and Au are used. An Au overlayer gives the largest PMA due to the largest in-plane lattice mismatch between Co and Au. An unusual effect was found by adding an additional layer on top of the Au overlayer. An additional Al capping layer on top of the Au overlayer reduces the PMA significantly. The possible explanation is that the misfit strain at the interface between the Al and the Au can be propagated through the Au layer to affect the magnetic properties of Co even though the in- plane lattice mismatch is less than 1%. Another interesting problem in interface interdiffusion and thermal stability in magnetic tunnel junction (MTJ) structures is studied using X-ray photoelectron spectroscopy (XPS). Since XPS is a very chemically sensitive technique, it allows us to monitor interface interdiffusion of the MTJ structures as-deposited and during post-deposition processing. For the plasma- oxidized samples, Fe only participates in the oxidation reduction process. In contrast to plasma-oxidized samples, there were no noticeable chemical shifts as- deposited and during post-deposition processing in air- oxidized samples. However, peak intensity variations were observed due to interface interdiffusion.
NASA Astrophysics Data System (ADS)
Hsueh, Yu-Li; Rogge, Matthew S.; Shaw, Wei-Tao; Kim, Jaedon; Yamamoto, Shu; Kazovsky, Leonid G.
2005-09-01
A simple and cost-effective upgrade of existing passive optical networks (PONs) is proposed, which realizes service overlay by novel spectral-shaping line codes. A hierarchical coding procedure allows processing simplicity and achieves desired long-term spectral properties. Different code rates are supported, and the spectral shape can be properly tailored to adapt to different systems. The computation can be simplified by quantization of trigonometric functions. DC balance is achieved by passing the dc residual between processing windows. The proposed line codes tend to introduce bit transitions to avoid long consecutive identical bits and facilitate receiver clock recovery. Experiments demonstrate and compare several different optimized line codes. For a specific tolerable interference level, the optimal line code can easily be determined, which maximizes the data throughput. The service overlay using the line-coding technique leaves existing services and field-deployed fibers untouched but fully functional, providing a very flexible and economic way to upgrade existing PONs.
NASA Astrophysics Data System (ADS)
Stockdale, Andrew
The use of low NOx boilers in coal fired power plants has resulted in sulfidizing corrosive conditions within the boilers and a reduction in the service lifetime of the waterwall tubes. As a solution to this problem, Ni-based weld overlays are used to provide the necessary corrosion resistance however; they are susceptible to corrosion fatigue. There are several metallurgical factors which give rise to corrosion fatigue that are associated with the localized melting and solidification of the weld overlay process. Coextruded coatings offer the potential for improved corrosion fatigue resistance since coextrusion is a solid state coating process. The corrosion and corrosion fatigue behavior of alloy 622 weld overlays and coextruded claddings was investigated using a Gleeble thermo-mechanical simulator retrofitted with a retort. The experiments were conducted at a constant temperature of 600°C using a simulated combustion gas of N2-10%CO-5%CO2-0.12%H 2S. An alternating stress profile was used with a minimum tensile stress of 0 MPa and a maximum tensile stress of 300 MPa (ten minute fatigue cycles). The results have demonstrated that the Gleeble can be used to successfully simulate the known corrosion fatigue cracking mechanism of Ni-based weld overlays in service. Multilayer corrosion scales developed on each of the claddings that consisted of inner and outer corrosion layers. The scales formed by the outward diffusion of cations and the inward diffusion of sulfur and oxygen anions. The corrosion fatigue behavior was influenced by the surface finish and the crack interactions. The initiation of a large number of corrosion fatigue cracks was not necessarily detrimental to the corrosion fatigue resistance. Finally, the as-received coextruded cladding exhibited the best corrosion fatigue resistance.
Fast 3D shape screening of large chemical databases through alignment-recycling
Fontaine, Fabien; Bolton, Evan; Borodina, Yulia; Bryant, Stephen H
2007-01-01
Background Large chemical databases require fast, efficient, and simple ways of looking for similar structures. Although such tasks are now fairly well resolved for graph-based similarity queries, they remain an issue for 3D approaches, particularly for those based on 3D shape overlays. Inspired by a recent technique developed to compare molecular shapes, we designed a hybrid methodology, alignment-recycling, that enables efficient retrieval and alignment of structures with similar 3D shapes. Results Using a dataset of more than one million PubChem compounds of limited size (< 28 heavy atoms) and flexibility (< 6 rotatable bonds), we obtained a set of a few thousand diverse structures covering entirely the 3D shape space of the conformers of the dataset. Transformation matrices gathered from the overlays between these diverse structures and the 3D conformer dataset allowed us to drastically (100-fold) reduce the CPU time required for shape overlay. The alignment-recycling heuristic produces results consistent with de novo alignment calculation, with better than 80% hit list overlap on average. Conclusion Overlay-based 3D methods are computationally demanding when searching large databases. Alignment-recycling reduces the CPU time to perform shape similarity searches by breaking the alignment problem into three steps: selection of diverse shapes to describe the database shape-space; overlay of the database conformers to the diverse shapes; and non-optimized overlay of query and database conformers using common reference shapes. The precomputation, required by the first two steps, is a significant cost of the method; however, once performed, querying is two orders of magnitude faster. Extensions and variations of this methodology, for example, to handle more flexible and larger small-molecules are discussed. PMID:17880744
High-NA EUV lithography enabling Moore's law in the next decade
NASA Astrophysics Data System (ADS)
van Schoot, Jan; Troost, Kars; Bornebroek, Frank; van Ballegoij, Rob; Lok, Sjoerd; Krabbendam, Peter; Stoeldraijer, Judon; Loopstra, Erik; Benschop, Jos P.; Finders, Jo; Meiling, Hans; van Setten, Eelco; Kneer, Bernhard; Kuerz, Peter; Kaiser, Winfried; Heil, Tilmann; Migura, Sascha; Neumann, Jens Timo
2017-10-01
While EUV systems equipped with a 0.33 Numerical Aperture lenses are readying to start volume manufacturing, ASML and Zeiss are ramping up their activities on a EUV exposure tool with Numerical Aperture of 0.55. The purpose of this scanner, targeting an ultimate resolution of 8nm, is to extend Moore's law throughout the next decade. A novel, anamorphic lens design, capable of providing the required Numerical Aperture has been investigated; This lens will be paired with new, faster stages and more accurate sensors enabling Moore's law economical requirements, as well as the tight focus and overlay control needed for future process nodes. The tighter focus and overlay control budgets, as well as the anamorphic optics, will drive innovations in the imaging and OPC modelling. Furthermore, advances in resist and mask technology will be required to image lithography features with less than 10nm resolution. This paper presents an overview of the target specifications, key technology innovations and imaging simulations demonstrating the advantages as compared to 0.33NA and showing the capabilities of the next generation EUV systems.
Guidelines on design and construction of high performance thin HMA overlays.
DOT National Transportation Integrated Search
2016-08-01
Key Components of Mix Design and Material Properties: : High-quality aggregate - SAC A for high : volume roads : - PG 70 or 76 (Polymer Modified binders) : - RAP and RAS (shingles) not allowed : - Minimum binder content ( Over 6%) : - Pay for binder ...
DOT National Transportation Integrated Search
2015-08-31
Proper calibration of mechanistic-empirical : (M-E) design and rehabilitation performance : models to meet Texas conditions is essential : for cost-effective flexible pavement designs. : Such a calibration effort would require a : reliable source of ...
Virtual design and construction of plumbing systems
NASA Astrophysics Data System (ADS)
Filho, João Bosco P. Dantas; Angelim, Bruno Maciel; Guedes, Joana Pimentel; de Castro, Marcelo Augusto Farias; Neto, José de Paula Barros
2016-12-01
Traditionally, the design coordination process is carried out by overlaying and comparing 2D drawings made by different project participants. Detecting information errors from a composite drawing is especially challenging and error prone. This procedure usually leaves many design errors undetected until construction begins, and typically lead to rework. Correcting conflict issues, which were not identified during design and coordination phase, reduces the overall productivity for everyone involved in the construction process. The identification of construction issues in the field generate Request for Information (RFIs) that is one of delays causes. The application of Virtual Design and Construction (VDC) tools to the coordination processes can bring significant value to architecture, structure, and mechanical, electrical, and plumbing (MEP) designs in terms of a reduced number of errors undetected and requests for information. This paper is focused on evaluating requests for information (RFI) associated with water/sanitary facilities of a BIM model. Thus, it is expected to add improvements of water/sanitary facility designs, as well as to assist the virtual construction team to notice and identify design problems. This is an exploratory and descriptive research. A qualitative methodology is used. This study adopts RFI's classification in six analyzed categories: correction, omission, validation of information, modification, divergence of information and verification. The results demonstrate VDC's contribution improving the plumbing system designs. Recommendations are suggested to identify and avoid these RFI types in plumbing system design process or during virtual construction.
Mandell, Jacob C; Khurana, Bharti; Folio, Les R; Hyun, Hyewon; Smith, Stacy E; Dunne, Ruth M; Andriole, Katherine P
2017-06-01
A methodology is described using Adobe Photoshop and Adobe Extendscript to process DICOM images with a Relative Attenuation-Dependent Image Overlay (RADIO) algorithm to visualize the full dynamic range of CT in one view, without requiring a change in window and level settings. The potential clinical uses for such an algorithm are described in a pictorial overview, including applications in emergency radiology, oncologic imaging, and nuclear medicine and molecular imaging.
Hasbrouck, W.P.
1983-01-01
Processing of data taken with the U.S. Geological Survey's coal-seismic system is done with a desktop, stand-alone computer. Programs for this computer are written in the extended BASIC language used by the Tektronix 4051 Graphic System. This report presents computer programs to perform X-square/T-square analyses and to plot normal moveout lines on a seismogram overlay.
How big does a coloured overlay have to be?
Waldie, Michelle; Wilkins, Arnold
2004-01-01
Coloured overlays and coloured lenses can both increase reading speed, but when they do their colour is not necessarily the same, suggesting that the beneficial effects of a coloured filter might depend upon the area of the visual field that it colours. We investigated the effects of overlays on reading speed and varied the size of the overlay and the colour of the surround. Children who had been assessed with coloured overlays were required to read a passage of randomly ordered common words. The words were printed in black ink as a block of text positioned centrally on an A4 page of white paper in landscape orientation. The speed of reading was compared under four conditions: (1) without an overlay; (2) with an overlay of the chosen colour covering the entire page; (3) with the overlay cut so that it just covered the text but left the margin white; (4) with the overlay of the chosen colour covering the text but with the margin coloured a complementary colour, using a second overlay. The children who were using an overlay read more quickly with the overlay; those who were no longer using the overlay did not. Although the block of text covered less than half the page, the colour and nature of the margin did not affect reading speed significantly. These findings suggest that in order to be effective at improving reading speed an overlay needs to cover the text, but not necessarily the remainder of the page, which means that smaller overlays may sometimes be sufficient.
Gu, Junsi; Fahrenkrug, Eli; Maldonado, Stephen
2014-09-02
The substrate-overlayer approach has been used to acquire surface enhanced Raman spectra (SERS) during and after electrochemical atomic layer deposition (ECALD) of CdSe, CdTe, and CdS thin films. The collected data suggest that SERS measurements performed with off-resonance (i.e. far from the surface plasmonic wavelength of the underlying SERS substrate) laser excitation do not introduce perturbations to the ECALD processes. Spectra acquired in this way afford rapid insight on the quality of the semiconductor film during the course of an ECALD process. For example, SERS data are used to highlight ECALD conditions that yield crystalline CdSe and CdS films. In contrast, SERS measurements with short wavelength laser excitation show evidence of photoelectrochemical effects that were not germane to the intended ECALD process. Using the semiconductor films prepared by ECALD, the substrate-overlayer SERS approach also affords analysis of semiconductor surface adsorbates. Specifically, Raman spectra of benzenethiol adsorbed onto CdSe, CdTe, and CdS films are detailed. Spectral shifts in the vibronic features of adsorbate bonding suggest subtle differences in substrate-adsorbate interactions, highlighting the sensitivity of this methodology.
The Mars mapper science and mission planning tool
NASA Technical Reports Server (NTRS)
Lo, Martin W.
1993-01-01
The Mars Mapper Program (MOm) is an interactive tool for science and mission design developed for the Mars Observer Mission (MO). MOm is a function of the Planning and Sequencing Element of the MO Ground Data System. The primary users of MOm are members of the science and mission planning teams. Using MOm, the user can display digital maps of Mars in various projections and resolutions ranging from 1 to 256 pixels per degree squared. The user can overlay the maps with ground tracks of the MO spacecraft (S/C) and footprints and swaths of the various instruments on-board the S/C. Orbital and instrument geometric parameters can be computed on demand and displayed on the digital map or plotted in XY-plots. The parameter data can also be saved into files for other uses. MOm is divided into 3 major processes: Generator, Mapper, Plotter. The Generator Process is the main control which spawns all other processes. The processes communicate via sockets. At any one time, only 1 copy of MOm may operate on the system. However, up to 5 copies of each of the major processes may be invoked from the Generator. MOm is developed on the Sun SPARCStation 2GX with menu driven graphical user interface (GUI). The map window and its overlays are mouse-sensitized to permit on-demand calculations of various parameters along an orbit. The program is currently under testing and will be delivered to the MO Mission System Configuration Management for distribution to the MO community in 3/93.
Plaquing procedure for infectious hematopoietic necrosis virus
Burke, J.A.; Mulcahy, D.
1980-01-01
A single overlay plaque assay was designed and evaluated for infectious hematopoietic necrosis virus. Epithelioma papillosum carpio cells were grown in normal atmosphere with tris(hydroxymethyl)aminomethane- or HEPES (N-2-hydroxyethylpiperazine-N'-2-ethanesulfonic acid)-buffered media. Plaques were larger and formed more quickly on 1- to 3-day-old cell monolayers than on older monolayers. Cell culture medium with a 10% addition of fetal calf serum (MEM 10) or without serum (MEM 0) were the most efficient virus diluents. Dilution with phosphate-buffered saline, saline, normal broth, or deionized water reduced plaque numbers. Variations in the pH (7.0 to 8.0) of a MEM 0 diluent did not affect plaque numbers. Increasing the volume of viral inoculum above 0.15 ml (15- by 60-mm plate) decreased plaquing efficiency. Significantly more plaques occurred under gum tragacanth and methylcellulose than under agar or agarose overlays. Varying the pH (6.8 to 7.4) of methylcellulose overlays did not significantly change plaque numbers. More plaques formed under the thicker overlays of both methylcellulose and gum tragacanth. Tris(hydroxymethyl)aminomethane and HEPES performed equally well, buffering either medium or overlay. Plaque numbers were reduced when cells were rinsed after virus adsorption or less than 1 h was allowed for adsorption. Variation in adsorption time between 60 and 180 min did not change plaque numbers. The mean plaque formation time was 7 days at 16 degrees C. The viral dose response was linear when the standardized assay was used.
Overlay improvement by exposure map based mask registration optimization
NASA Astrophysics Data System (ADS)
Shi, Irene; Guo, Eric; Chen, Ming; Lu, Max; Li, Gordon; Li, Rivan; Tian, Eric
2015-03-01
Along with the increased miniaturization of semiconductor electronic devices, the design rules of advanced semiconductor devices shrink dramatically. [1] One of the main challenges of lithography step is the layer-to-layer overlay control. Furthermore, DPT (Double Patterning Technology) has been adapted for the advanced technology node like 28nm and 14nm, corresponding overlay budget becomes even tighter. [2][3] After the in-die mask registration (pattern placement) measurement is introduced, with the model analysis of a KLA SOV (sources of variation) tool, it's observed that registration difference between masks is a significant error source of wafer layer-to-layer overlay at 28nm process. [4][5] Mask registration optimization would highly improve wafer overlay performance accordingly. It was reported that a laser based registration control (RegC) process could be applied after the pattern generation or after pellicle mounting and allowed fine tuning of the mask registration. [6] In this paper we propose a novel method of mask registration correction, which can be applied before mask writing based on mask exposure map, considering the factors of mask chip layout, writing sequence, and pattern density distribution. Our experiment data show if pattern density on the mask keeps at a low level, in-die mask registration residue error in 3sigma could be always under 5nm whatever blank type and related writer POSCOR (position correction) file was applied; it proves random error induced by material or equipment would occupy relatively fixed error budget as an error source of mask registration. On the real production, comparing the mask registration difference through critical production layers, it could be revealed that registration residue error of line space layers with higher pattern density is always much larger than the one of contact hole layers with lower pattern density. Additionally, the mask registration difference between layers with similar pattern density could also achieve under 5nm performance. We assume mask registration excluding random error is mostly induced by charge accumulation during mask writing, which may be calculated from surrounding exposed pattern density. Multi-loading test mask registration result shows that with x direction writing sequence, mask registration behavior in x direction is mainly related to sequence direction, but mask registration in y direction would be highly impacted by pattern density distribution map. It proves part of mask registration error is due to charge issue from nearby environment. If exposure sequence is chip by chip for normal multi chip layout case, mask registration of both x and y direction would be impacted analogously, which has also been proved by real data. Therefore, we try to set up a simple model to predict the mask registration error based on mask exposure map, and correct it with the given POSCOR (position correction) file for advanced mask writing if needed.
Overlay improvement methods with diffraction based overlay and integrated metrology
NASA Astrophysics Data System (ADS)
Nam, Young-Sun; Kim, Sunny; Shin, Ju Hee; Choi, Young Sin; Yun, Sang Ho; Kim, Young Hoon; Shin, Si Woo; Kong, Jeong Heung; Kang, Young Seog; Ha, Hun Hwan
2015-03-01
To accord with new requirement of securing more overlay margin, not only the optical overlay measurement is faced with the technical limitations to represent cell pattern's behavior, but also the larger measurement samples are inevitable for minimizing statistical errors and better estimation of circumstance in a lot. From these reasons, diffraction based overlay (DBO) and integrated metrology (IM) were mainly proposed as new approaches for overlay enhancement in this paper.
NASA Technical Reports Server (NTRS)
Barrett, Joe H., III; Lafosse, Richard; Hood, Doris; Hoeth, Brian
2007-01-01
Graphical overlays can be created in real-time in the Advanced Weather Interactive Processing System (AWIPS) using shapefiles or DARE Graphics Metafile (DGM) files. This presentation describes how to create graphical overlays on-the-fly for AWIPS, by using two examples of AWIPS applications that were created by the Applied Meteorology Unit (AMU). The first example is the Anvil Threat Corridor Forecast Tool, which produces a shapefile that depicts a graphical threat corridor of the forecast movement of thunderstorm anvil clouds, based on the observed or forecast upper-level winds. This tool is used by the Spaceflight Meteorology Group (SMG) and 45th Weather Squadron (45 WS) to analyze the threat of natural or space vehicle-triggered lightning over a location. The second example is a launch and landing trajectory tool that produces a DGM file that plots the ground track of space vehicles during launch or landing. The trajectory tool can be used by SMG and the 45 WS forecasters to analyze weather radar imagery along a launch or landing trajectory. Advantages of both file types will be listed.
Wafer-shape metrics based foundry lithography
NASA Astrophysics Data System (ADS)
Kim, Sungtae; Liang, Frida; Mileham, Jeffrey; Tsai, Damon; Bouche, Eric; Lee, Sean; Huang, Albert; Hua, C. F.; Wei, Ming Sheng
2017-03-01
As device shrink, there are many difficulties with process integration and device yield. Lithography process control is expected to be a major challenge due to tighter overlay and focus control requirement. The understanding and control of stresses accumulated during device fabrication has becoming more critical at advanced technology nodes. Within-wafer stress variations cause local wafer distortions which in turn present challenges for managing overlay and depth of focus during lithography. A novel technique for measuring distortion is Coherent Gradient Sensing (CGS) interferometry, which is capable of generating a high-density distortion data set of the full wafer within a time frame suitable for a high volume manufacturing (HVM) environment. In this paper, we describe the adoption of CGS (Coherent Gradient Sensing) interferometry into high volume foundry manufacturing to overcome these challenges. Leveraging this high density 3D metrology, we characterized its In-plane distortion as well as its topography capabilities applied to the full flow of an advanced foundry manufacturing. Case studies are presented that summarize the use of CGS data to reveal correlations between in-plane distortion and overlay variation as well as between topography and device yield.
Bermuda Triangle: a subsystem of the 168/E interfacing scheme used by Group B at SLAC
DOE Office of Scientific and Technical Information (OSTI.GOV)
Oxoby, G.J.; Levinson, L.J.; Trang, Q.H.
1979-12-01
The Bermuda Triangle system is a method of interfacing several 168/E microprocessors to a central system for control of the processors and overlaying their memories. The system is a three-way interface with I/O ports to a large buffer memory, a PDP11 Unibus and a bus to the 168/E processors. Data may be transferred bidirectionally between any two ports. Two Bermuda Triangles are used, one for the program memory and one for the data memory. The program buffer memory stores the overlay programs for the 168/E, and the data buffer memory, the incoming raw data, the data portion of the overlays,more » and the outgoing processed events. This buffering is necessary since the memories of 168/E microprocessors are small compared to the main program and the amount of data being processed. The link to the computer facility is via a Unibus to IBM channel interface. A PDP11/04 controls the data flow. 7 figures, 4 tables. (RWR)« less
NASA Technical Reports Server (NTRS)
Dunne, Matthew J.
2011-01-01
The development of computer software as a tool to generate visual displays has led to an overall expansion of automated computer generated images in the aerospace industry. These visual overlays are generated by combining raw data with pre-existing data on the object or objects being analyzed on the screen. The National Aeronautics and Space Administration (NASA) uses this computer software to generate on-screen overlays when a Visiting Vehicle (VV) is berthing with the International Space Station (ISS). In order for Mission Control Center personnel to be a contributing factor in the VV berthing process, computer software similar to that on the ISS must be readily available on the ground to be used for analysis. In addition, this software must perform engineering calculations and save data for further analysis.
Polymer concrete overlay on SH-51, bridge deck
NASA Astrophysics Data System (ADS)
Borg, T. M.
1982-06-01
A thin resinous overlay was placed on a sound bridge deck in Oklahoma to evaluate its performance over one year using various physical tests. The evaluation shows how well the overlay protects the reinforcing steel from corrosion due to deicing salts. The steps leading to the construction of the overlay are detailed as well as the actual placing of the overlay. The results of various physical tests are reported for both before and after the overlay.
Computational overlay metrology with adaptive data analytics
NASA Astrophysics Data System (ADS)
Schmitt-Weaver, Emil; Subramony, Venky; Ullah, Zakir; Matsunobu, Masazumi; Somasundaram, Ravin; Thomas, Joel; Zhang, Linmiao; Thul, Klaus; Bhattacharyya, Kaustuve; Goossens, Ronald; Lambregts, Cees; Tel, Wim; de Ruiter, Chris
2017-03-01
With photolithography as the fundamental patterning step in the modern nanofabrication process, every wafer within a semiconductor fab will pass through a lithographic apparatus multiple times. With more than 20,000 sensors producing more than 700GB of data per day across multiple subsystems, the combination of a light source and lithographic apparatus provide a massive amount of information for data analytics. This paper outlines how data analysis tools and techniques that extend insight into data that traditionally had been considered unmanageably large, known as adaptive analytics, can be used to show how data collected before the wafer is exposed can be used to detect small process dependent wafer-towafer changes in overlay.
DOT National Transportation Integrated Search
2011-10-01
The primary focus of this research was to determine the effects of design and construction features, such as overlay : thickness and mix type, presence of milling, and type of restoration, on pavement response and performance and to : establish their...
Aerodynamic design and analysis system for supersonic aircraft. Part 3: Computer program description
NASA Technical Reports Server (NTRS)
Middleton, W. D.; Lundry, J. L.; Coleman, R. G.
1975-01-01
The computer program for the design and analysis of supersonic aircraft configurations is presented. The schematics of the program structure are provided. The individual overlays and subroutines are described. The system is useful in determining surface pressures and supersonic area rule concepts.
Man's role in integrated control and information management systems
NASA Technical Reports Server (NTRS)
Nevins, J. L.; Johnson, I. S.
1972-01-01
Display control considerations associated with avionics techniques are discussed. General purpose displays and a prototype interactive display/command design featuring a pushplate CRT overlay for command input are considered.
Patterning control strategies for minimum edge placement error in logic devices
NASA Astrophysics Data System (ADS)
Mulkens, Jan; Hanna, Michael; Slachter, Bram; Tel, Wim; Kubis, Michael; Maslow, Mark; Spence, Chris; Timoshkov, Vadim
2017-03-01
In this paper we discuss the edge placement error (EPE) for multi-patterning semiconductor manufacturing. In a multi-patterning scheme the creation of the final pattern is the result of a sequence of lithography and etching steps, and consequently the contour of the final pattern contains error sources of the different process steps. We describe the fidelity of the final pattern in terms of EPE, which is defined as the relative displacement of the edges of two features from their intended target position. We discuss our holistic patterning optimization approach to understand and minimize the EPE of the final pattern. As an experimental test vehicle we use the 7-nm logic device patterning process flow as developed by IMEC. This patterning process is based on Self-Aligned-Quadruple-Patterning (SAQP) using ArF lithography, combined with line cut exposures using EUV lithography. The computational metrology method to determine EPE is explained. It will be shown that ArF to EUV overlay, CDU from the individual process steps, and local CD and placement of the individual pattern features, are the important contributors. Based on the error budget, we developed an optimization strategy for each individual step and for the final pattern. Solutions include overlay and CD metrology based on angle resolved scatterometry, scanner actuator control to enable high order overlay corrections and computational lithography optimization to minimize imaging induced pattern placement errors of devices and metrology targets.
M-DAS: System for multispectral data analysis. [in Saginaw Bay, Michigan
NASA Technical Reports Server (NTRS)
Johnson, R. H.
1975-01-01
M-DAS is a ground data processing system designed for analysis of multispectral data. M-DAS operates on multispectral data from LANDSAT, S-192, M2S and other sources in CCT form. Interactive training by operator-investigators using a variable cursor on a color display was used to derive optimum processing coefficients and data on cluster separability. An advanced multivariate normal-maximum likelihood processing algorithm was used to produce output in various formats: color-coded film images, geometrically corrected map overlays, moving displays of scene sections, coverage tabulations and categorized CCTs. The analysis procedure for M-DAS involves three phases: (1) screening and training, (2) analysis of training data to compute performance predictions and processing coefficients, and (3) processing of multichannel input data into categorized results. Typical M-DAS applications involve iteration between each of these phases. A series of photographs of the M-DAS display are used to illustrate M-DAS operation.
Interplanetary Overlay Network Bundle Protocol Implementation
NASA Technical Reports Server (NTRS)
Burleigh, Scott C.
2011-01-01
The Interplanetary Overlay Network (ION) system's BP package, an implementation of the Delay-Tolerant Networking (DTN) Bundle Protocol (BP) and supporting services, has been specifically designed to be suitable for use on deep-space robotic vehicles. Although the ION BP implementation is unique in its use of zero-copy objects for high performance, and in its use of resource-sensitive rate control, it is fully interoperable with other implementations of the BP specification (Internet RFC 5050). The ION BP implementation is built using the same software infrastructure that underlies the implementation of the CCSDS (Consultative Committee for Space Data Systems) File Delivery Protocol (CFDP) built into the flight software of Deep Impact. It is designed to minimize resource consumption, while maximizing operational robustness. For example, no dynamic allocation of system memory is required. Like all the other ION packages, ION's BP implementation is designed to port readily between Linux and Solaris (for easy development and for ground system operations) and VxWorks (for flight systems operations). The exact same source code is exercised in both environments. Initially included in the ION BP implementations are the following: libraries of functions used in constructing bundle forwarders and convergence-layer (CL) input and output adapters; a simple prototype bundle forwarder and associated CL adapters designed to run over an IPbased local area network; administrative tools for managing a simple DTN infrastructure built from these components; a background daemon process that silently destroys bundles whose time-to-live intervals have expired; a library of functions exposed to applications, enabling them to issue and receive data encapsulated in DTN bundles; and some simple applications that can be used for system checkout and benchmarking.
Computer mapping of LANDSAT data for environmental applications
NASA Technical Reports Server (NTRS)
Rogers, R. H. (Principal Investigator); Mckeon, J. B.; Reed, L. E.; Schmidt, N. F.; Schecter, R. N.
1975-01-01
The author has identified the following significant results. Land cover overlays and maps produced from LANDSAT are providing information on existing land use and resources throughout the 208 study area. The overlays are being used to delineate drainage areas of a predominant land cover type. Information on cover type is also being combined with other pertinent data to develop estimates of sediment and nutrients flows from the drainage area. The LANDSAT inventory of present land cover together with population projects is providing a basis for developing maps of anticipated land use patterns required to evaluate impact on water quality which may result from these patterns. Overlays of forest types were useful for defining wildlife habitat and vegetational resources in the region. LANDSAT data and computer assisted interpretation was found to be a rapid cost effective procedure for inventorying land cover on a regional basis. The entire 208 inventory which include acquisition of ground truth, LANDSAT tapes, computer processing, and production of overlays and coded tapes was completed within a period of 2 months at a cost of about 0.6 cents per acre, a significant improvement in time and cost over conventional photointerpretation and mapping techniques.
Cleaning of copper traces on circuit boards with excimer laser radiation
NASA Astrophysics Data System (ADS)
Wesner, D. A.; Mertin, M.; Lupp, F.; Kreutz, E. W.
1996-04-01
Cleaning of Cu traces on circuit boards is studied using pulsed excimer laser radiation (pulse width ˜ 20 ns, wavelength 248 nm), with the goal of improving the properties of the Cu surface for soldering and bonding. Traces with well-defined oxide overlayers are cleaned by irradiation in air using ≤ 10 3 laser pulses at fluences per pulse of ≤ 2 J cm -2. After treatment the surface morphology is analyzed using optical microscopy, optical profilometry, and scanning electron microscopy, while the chemical state of the surface is investigated with X-ray photoelectron (XPS) spectroscopy. Ellipsometry is used to determine the oxide overlayer thickness. Prior to cleaning samples exhibit a contamination overlayer about 15-25 nm in thickness containing Cu 2O and C. Cleaning reduces the overlayer thickness to ≤ 10 nm by material removal. The process tends to be self-limiting, since the optical reflectivity of the oxidized Cu surface for laser radiation is smaller than that of the cleaned surface. Additionally, the interaction with the laser radiation results in surface segregation of a minor alloy component out of the bulk (e.g. Zn), which may help to passivate the surface for further chemical reactions.
The effect of coloured overlays and lenses on reading: a systematic review of the literature.
Griffiths, Philip G; Taylor, Robert H; Henderson, Lisa M; Barrett, Brendan T
2016-09-01
There are many anecdotal claims and research reports that coloured lenses and overlays improve reading performance. Here we present the results of a systematic review of this literature and examine the quality of the evidence. We systematically reviewed the literature concerning the effect of coloured lenses or overlays on reading performance by searching the PsychInfo, Medline and Embase databases. This revealed 51 published items (containing 54 data sets). Given that different systems are in use for issuing coloured overlays or lenses, we reviewed the evidence under four separate system headings (Intuitive, Irlen, Harris/Chromagen and Other), classifying each published item using the Cochrane Risk of Bias tool. Although the different colour systems have been subjected to different amounts of scientific scrutiny, the results do not differ according to the system type, or whether the sample under investigation was classified as having visual stress (or a similarly defined condition), reading difficulty, or both. The majority of studies are subject to 'high' or 'uncertain' risk of bias in one or more key aspects of study design or outcome, with studies at lower risk from bias providing less support for the benefit of coloured lenses/overlays on reading ability. While many studies report improvements with coloured lenses, the effect size is generally small and/or similar to the improvement found with a placebo condition. We discuss the strengths and shortcomings of the published literature and, whilst acknowledging the difficulties associated with conducting trials of this type, offer some suggestions about how future trials might be conducted. Consistent with previous reviews and advice from several professional bodies, we conclude that the use of coloured lenses or overlays to ameliorate reading difficulties cannot be endorsed and that any benefits reported by individuals in clinical settings are likely to be the result of placebo, practice or Hawthorne effects. © 2016 The Authors Ophthalmic & Physiological Optics © 2016 The College of Optometrists.
Lee, Sangik; Yoon, Chansoo; Lee, Ji Hye; Kim, Yeon Soo; Lee, Mi Jung; Kim, Wondong; Baik, Jaeyoon; Jia, Quanxi; Park, Bae Ho
2018-06-06
Two-dimensional (2D)-layered semiconducting materials with considerable band gaps are emerging as a new class of materials applicable to next-generation devices. Particularly, black phosphorus (BP) is considered to be very promising for next-generation 2D electrical and optical devices because of its high carrier mobility of 200-1000 cm 2 V -1 s -1 and large on/off ratio of 10 4 to 10 5 in field-effect transistors (FETs). However, its environmental instability in air requires fabrication processes in a glovebox filled with nitrogen or argon gas followed by encapsulation, passivation, and chemical functionalization of BP. Here, we report a new method for reduction of BP-channel devices fabricated without the use of a glovebox by galvanic corrosion of an Al overlayer. The reduction of BP induced by an anodic oxidation of Al overlayer is demonstrated through surface characterization of BP using atomic force microscopy, Raman spectroscopy, and X-ray photoemission spectroscopy along with electrical measurement of a BP-channel FET. After the deposition of an Al overlayer, the FET device shows a significantly enhanced performance, including restoration of ambipolar transport, high carrier mobility of 220 cm 2 V -1 s -1 , low subthreshold swing of 0.73 V/decade, and low interface trap density of 7.8 × 10 11 cm -2 eV -1 . These improvements are attributed to both the reduction of the BP channel and the formation of an Al 2 O 3 interfacial layer resulting in a high- k screening effect. Moreover, ambipolar behavior of our BP-channel FET device combined with charge-trap behavior can be utilized for implementing reconfigurable memory and neuromorphic computing applications. Our study offers a simple device fabrication process for BP-channel FETs with high performance using galvanic oxidation of Al overlayers.
ODOT research news : fall 2007.
DOT National Transportation Integrated Search
2007-01-01
The newsletter includes: : 1) Several manufacturers have designed geosynthetic products to prevent or lessen reflective cracking. The materials are supposed to minimize tension transferred to the overlay from the existing pavement. : 2) Results of th...
75 FR 51161 - Notice of Passenger Facility Charge (PFC) Approvals and Disapprovals
Federal Register 2010, 2011, 2012, 2013, 2014
2010-08-18
... approach path indicator systems. By-pass taxiway and hold apron. Master plan update. Airfield signage... mandates. Concourse A and B. Overlay taxiway C and connectors. Engineer/design airfield signage...
Challenges of image placement and overlay at the 90-nm and 65-nm nodes
NASA Astrophysics Data System (ADS)
Trybula, Walter J.
2003-05-01
The technology acceleration of the ITRS Roadmap has many implications on both the semiconductor supplier community and the manufacturers. INTERNATIONAL SE-MATECH has been leading and supporting efforts to investigate the impact of the tech-nology introduction. This paper examines the issue of manufacturing tolerances available for image placement on adjacent critical levels (overlay) at the 90nm and 65nm technol-ogy nodes. The allowable values from the 2001 release of the ITRS Roadmap are 32nm for the 90nm node, and 23nm for the 65nm node. Even the 130nm node has overlay requirements of only 46nm. Employing tolerances that can be predicted, the impact of existing production/processing tolerance accumulation can provide an indication of the challenges facing the manufacturer in the production of 90nm and 65nm Node devices.
Modeling the dynamical interaction between epidemics on overlay networks
NASA Astrophysics Data System (ADS)
Marceau, Vincent; Noël, Pierre-André; Hébert-Dufresne, Laurent; Allard, Antoine; Dubé, Louis J.
2011-08-01
Epidemics seldom occur as isolated phenomena. Typically, two or more viral agents spread within the same host population and may interact dynamically with each other. We present a general model where two viral agents interact via an immunity mechanism as they propagate simultaneously on two networks connecting the same set of nodes. By exploiting a correspondence between the propagation dynamics and a dynamical process performing progressive network generation, we develop an analytical approach that accurately captures the dynamical interaction between epidemics on overlay networks. The formalism allows for overlay networks with arbitrary joint degree distribution and overlap. To illustrate the versatility of our approach, we consider a hypothetical delayed intervention scenario in which an immunizing agent is disseminated in a host population to hinder the propagation of an undesirable agent (e.g., the spread of preventive information in the context of an emerging infectious disease).
An Overlay Architecture for Throughput Optimal Multipath Routing
2017-01-14
1 An Overlay Architecture for Throughput Optimal Multipath Routing Nathaniel M. Jones, Georgios S. Paschos, Brooke Shrader, and Eytan Modiano...decisions. In this work, we study an overlay architecture for dynamic routing such that only a subset of devices (overlay nodes) need to make dynamic routing...a legacy network. Network overlays are frequently used to deploy new communication architectures in legacy networks [13]. To accomplish this, messages
Double patterning from design enablement to verification
NASA Astrophysics Data System (ADS)
Abercrombie, David; Lacour, Pat; El-Sewefy, Omar; Volkov, Alex; Levine, Evgueni; Arb, Kellen; Reid, Chris; Li, Qiao; Ghosh, Pradiptya
2011-11-01
Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers. We discuss the unique design and process characteristics of LELE DP, the challenges they present, and various solutions. ∘ We examine DP design methodologies, current DP conflict feedback mechanisms, and how they can help designers identify and resolve conflicts. ∘ In place and route (P&R), the placement engine must now be aware of the assumptions made during IP cell design, and use placement directives provide by the library designer. We examine the new effects DP introduces in detail routing, discuss how multiple choices of LELE and the cut allowances can lead to different solutions, and describe new capabilities required by detail routers and P&R engines. ∘ We discuss why LELE DP cuts and overlaps are critical to optical process correction (OPC), and how a hybrid mechanism of rule and model-based overlap generation can provide a fast and effective solution. ∘ With two litho-etch steps, mask misalignment and image rounding are now verification considerations. We present enhancements to the OPCVerify engine that check for pinching and bridging in the presence of DP overlay errors and acute angles.
Human-Robot Interaction Directed Research Project
NASA Technical Reports Server (NTRS)
Sandor, Aniko; Cross, Ernest V., II; Chang, M. L.
2014-01-01
Human-robot interaction (HRI) is a discipline investigating the factors affecting the interactions between humans and robots. It is important to evaluate how the design of interfaces and command modalities affect the human's ability to perform tasks accurately, efficiently, and effectively when working with a robot. By understanding the effects of interface design on human performance, workload, and situation awareness, interfaces can be developed to appropriately support the human in performing tasks with minimal errors and with appropriate interaction time and effort. Thus, the results of research on human-robot interfaces have direct implications for the design of robotic systems. This DRP concentrates on three areas associated with interfaces and command modalities in HRI which are applicable to NASA robot systems: 1) Video Overlays, 2) Camera Views, and 3) Command Modalities. The first study focused on video overlays that investigated how Augmented Reality (AR) symbology can be added to the human-robot interface to improve teleoperation performance. Three types of AR symbology were explored in this study, command guidance (CG), situation guidance (SG), and both (SCG). CG symbology gives operators explicit instructions on what commands to input, whereas SG symbology gives operators implicit cues so that operators can infer the input commands. The combination of CG and SG provided operators with explicit and implicit cues allowing the operator to choose which symbology to utilize. The objective of the study was to understand how AR symbology affects the human operator's ability to align a robot arm to a target using a flight stick and the ability to allocate attention between the symbology and external views of the world. The study evaluated the effects type of symbology (CG and SG) has on operator tasks performance and attention allocation during teleoperation of a robot arm. The second study expanded on the first study by evaluating the effects of the type of navigational guidance (CG and SG) on operator task performance and attention allocation during teleoperation of a robot arm through uplinked commands. Although this study complements the first study on navigational guidance with hand controllers, it is a separate investigation due to the distinction in intended operators (i.e., crewmembers versus ground-operators). A third study looked at superimposed and integrated overlays for teleoperation of a mobile robot using a hand controller. When AR is superimposed on the external world, it appears to be fixed onto the display and internal to the operators' workstation. Unlike superimposed overlays, integrated overlays often appear as three-dimensional objects and move as if part of the external world. Studies conducted in the aviation domain show that integrated overlays can improve situation awareness and reduce the amount of deviation from the optimal path. The purpose of the study was to investigate whether these results apply to HRI tasks, such as navigation with a mobile robot. HRP GAPS This HRI research contributes to closure of HRP gaps by providing information on how display and control characteristics - those related to guidance, feedback, and command modalities - affect operator performance. The overarching goals are to improve interface usability, reduce operator error, and develop candidate guidelines to design effective human-robot interfaces.
A method for predicting optimized processing parameters for surfacing
DOE Office of Scientific and Technical Information (OSTI.GOV)
Dupont, J.N.; Marder, A.R.
1994-12-31
Welding is used extensively for surfacing applications. To operate a surfacing process efficiently, the variables must be optimized to produce low levels of dilution with the substrate while maintaining high deposition rates. An equation for dilution in terms of the welding variables, thermal efficiency factors, and thermophysical properties of the overlay and substrate was developed by balancing energy and mass terms across the welding arc. To test the validity of the resultant dilution equation, the PAW, GTAW, GMAW, and SAW processes were used to deposit austenitic stainless steel onto carbon steel over a wide range of parameters. Arc efficiency measurementsmore » were conducted using a Seebeck arc welding calorimeter. Melting efficiency was determined based on knowledge of the arc efficiency. Dilution was determined for each set of processing parameters using a quantitative image analysis system. The pertinent equations indicate dilution is a function of arc power (corrected for arc efficiency), filler metal feed rate, melting efficiency, and thermophysical properties of the overlay and substrate. With the aid of the dilution equation, the effect of processing parameters on dilution is presented by a new processing diagram. A new method is proposed for determining dilution from welding variables. Dilution is shown to depend on the arc power, filler metal feed rate, arc and melting efficiency, and the thermophysical properties of the overlay and substrate. Calculated dilution levels were compared with measured values over a large range of processing parameters and good agreement was obtained. The results have been applied to generate a processing diagram which can be used to: (1) predict the maximum deposition rate for a given arc power while maintaining adequate fusion with the substrate, and (2) predict the resultant level of dilution with the substrate.« less
ERIC Educational Resources Information Center
Damkaci, Fehmi; Braun, Timothy F.; Gublo, Kristin
2017-01-01
We describe the design and implementation of an undergraduate peer mentor program that can overlay an existing general chemistry laboratory and is designed to improve STEM student retention. For the first four freshman cohorts going through the program, year-to-year retention improved by a four-year average of 20% for students in peer-mentored…
Concrete overlays : an established technology with new applications
DOT National Transportation Integrated Search
2008-08-01
CPTP is an integrated, national effort to improve the long-term performance and cost-effectiveness of concrete pavements by implementing improved methods of design, construction, and rehabilitation and new technology. CPTP is an integrated, national ...
Evaluation of the AISI 904L Alloy Weld Overlays Obtained by GMAW and Electro-Slag Welding Processes
NASA Astrophysics Data System (ADS)
Jorge, Jorge C. F.; Meira, O. G.; Madalena, F. C. A.; de Souza, L. F. G.; Araujo, L. S.; Mendes, M. C.
2017-05-01
The use of superaustenitic stainless steels (SASS) as an overlay replacement for nickel-based alloys can be an interesting alternative for the oil and gas industries, due to its lower cost, when compared to superalloys. Usually, the deposition is made with several welding passes by using conventional arc welding processes, such as gas tungsten arc welding (GTAW) or gas metal arc welding (GMAW) processes. In this respect, electro-slag welding (ESW), which promotes high heat inputs and low dilution of the welds, can also be attractive for this application, as it provides a higher productivity, once only one layer is needed for the deposition of the minimum thickness required. The present work evaluates the behavior of an AISI 904L SASS weld overlay deposited on a carbon steel ASTM A516 Grade 70 by ESW and GMAW processes. Both as-welded and heat-treated conditions were evaluated and compared. A multipass welding by GMAW process with three layers and 48 passes was performed on 12.5 × 200 × 250 mm steel plates with average welding energy of 1.0 kJ/mm. For ESW process, only one layer was deposited on 50 × 400 × 400 mm steel plates with average welding energy of 11.7 kJ/mm. After welding, a post-weld heat treatment (PWHT) at 620 °C for 10 h was performed in half of the steel plate, in order to allow the comparison between this condition and the as-welded one. For both processes, the austenitic microstructure of the weld deposits was characterized by optical microscopy and scanning electron microscopy with electron backscatter diffraction. A low proportion of secondary phases were observed in all conditions, and the PWHT did not promote significant changes on the hardness profile. Martensite for GMAW process and bainite for ESW process were the microstructural constituents observed at the coarse grain heat-affected zone, due to the different cooling rates. For ESW process, no evidences of partially diluted zones were found. As a consequence of the microstructural findings, the hardness results for ESW were lower than those usually observed for other electric arc welding processes. In addition, specimens subject to bending tests performed in accordance with the current standards used for qualification of welding procedures were approved. These evidences allow the conclusion that the ESW process can provide deposits with high quality despite the high welding energy levels, in order to achieve the desired productivity, being an interesting alternative for AISI 904L weld overlays.
Development Report for the 10 KW Sound Attenuation Program (Preproduction ’F’ Kit).
1981-12-02
3.2 Panel Design The panels were to be constructed from solid aluminum sheet metal on all ex- ; terior surfaces and acoustic fiberglass or mineral ... wool bill overlayed with a synthetic film and encapsulated with perforated aluminum on the interior sur- faces. Per design, the acoustic panels on the
Human-Robot Interaction Directed Research Project
NASA Technical Reports Server (NTRS)
Sandor, Aniko; Cross, Ernest V., II; Chang, Mai Lee
2014-01-01
Human-robot interaction (HRI) is a discipline investigating the factors affecting the interactions between humans and robots. It is important to evaluate how the design of interfaces and command modalities affect the human's ability to perform tasks accurately, efficiently, and effectively when working with a robot. By understanding the effects of interface design on human performance, workload, and situation awareness, interfaces can be developed to appropriately support the human in performing tasks with minimal errors and with appropriate interaction time and effort. Thus, the results of research on human-robot interfaces have direct implications for the design of robotic systems. This DRP concentrates on three areas associated with interfaces and command modalities in HRI which are applicable to NASA robot systems: 1) Video Overlays, 2) Camera Views, and 3) Command Modalities. The first study focused on video overlays that investigated how Augmented Reality (AR) symbology can be added to the human-robot interface to improve teleoperation performance. Three types of AR symbology were explored in this study, command guidance (CG), situation guidance (SG), and both (SCG). CG symbology gives operators explicit instructions on what commands to input, whereas SG symbology gives operators implicit cues so that operators can infer the input commands. The combination of CG and SG provided operators with explicit and implicit cues allowing the operator to choose which symbology to utilize. The objective of the study was to understand how AR symbology affects the human operator's ability to align a robot arm to a target using a flight stick and the ability to allocate attention between the symbology and external views of the world. The study evaluated the effects type of symbology (CG and SG) has on operator tasks performance and attention allocation during teleoperation of a robot arm. The second study expanded on the first study by evaluating the effects of the type of navigational guidance (CG and SG) on operator task performance and attention allocation during teleoperation of a robot arm through uplinked commands. Although this study complements the first study on navigational guidance with hand controllers, it is a separate investigation due to the distinction in intended operators (i.e., crewmembers versus ground-operators). A third study looked at superimposed and integrated overlays for teleoperation of a mobile robot using a hand controller. When AR is superimposed on the external world, it appears to be fixed onto the display and internal to the operators' workstation. Unlike superimposed overlays, integrated overlays often appear as three-dimensional objects and move as if part of the external world. Studies conducted in the aviation domain show that integrated overlays can improve situation awareness and reduce the amount of deviation from the optimal path. The purpose of the study was to investigate whether these results apply to HRI tasks, such as navigation with a mobile robot.
Predicting the accuracy of ligand overlay methods with Random Forest models.
Nandigam, Ravi K; Evans, David A; Erickson, Jon A; Kim, Sangtae; Sutherland, Jeffrey J
2008-12-01
The accuracy of binding mode prediction using standard molecular overlay methods (ROCS, FlexS, Phase, and FieldCompare) is studied. Previous work has shown that simple decision tree modeling can be used to improve accuracy by selection of the best overlay template. This concept is extended to the use of Random Forest (RF) modeling for template and algorithm selection. An extensive data set of 815 ligand-bound X-ray structures representing 5 gene families was used for generating ca. 70,000 overlays using four programs. RF models, trained using standard measures of ligand and protein similarity and Lipinski-related descriptors, are used for automatically selecting the reference ligand and overlay method maximizing the probability of reproducing the overlay deduced from X-ray structures (i.e., using rmsd < or = 2 A as the criteria for success). RF model scores are highly predictive of overlay accuracy, and their use in template and method selection produces correct overlays in 57% of cases for 349 overlay ligands not used for training RF models. The inclusion in the models of protein sequence similarity enables the use of templates bound to related protein structures, yielding useful results even for proteins having no available X-ray structures.
DOT National Transportation Integrated Search
1995-07-01
This report documents the construction and performance of two thin polymer concrete (with polyester/styrene resins) bridge deck overlays. The overlays were constructed in Biggs and Maupin, Oregon in June 1993. Construction of the overlays was less th...
DOE Office of Scientific and Technical Information (OSTI.GOV)
Lai, Qinghua; Skoglund, Michael D.; Zhang, Chen
Overlayer Pt on Ni (Ni@Pt) or Co (Co@Pt) were synthesized and tested for H2 generation from APR of lactose. H2 chemisorption descriptor showed that Ni@Pt and Co@Pt overlayer catalysts had reduced H2 adsorption strength compared to a Pt only catalyst, which agree with computational predictions. The overlayer catalysts also demonstrated lower activity for ethylene hydrogenation than the Pt only catalyst, which likely resulted from decreased H2 binding strength decreasing the surface coverage of H2. XAS results showed that overlayer catalysts exhibited higher white line intensity than the Pt catalyst, which indicates a negative d-band shift for the Pt overlayer, furthermore » providing evidence for overlayer formation. Lactose APR studies showed that lactose can be used as feedstock to produce H2 and CO under desirable reaction conditions. The Pt active sites of Ni@Pt and Co@Pt overlayer catalysts showed significantly enhanced H2 production selectivity and activity when compared with that of a Pt only catalyst. The single deposition overlayer with the largest d-band shift showed the highest H2 activity. The results suggest that overlayer formation using directed deposition technique could modify the behavior of the surface metal and ultimately modify the APR activity.« less
Betz, J.W.; Blanco, M.A.; Cahn, C.R.; Dafesh, P.A.; Hegarty, C.J.; Hudnut, K.W.; Kasemsri, V.; Keegan, R.; Kovach, K.; Lenahan, L.S.; Ma, H.H.; Rushanan, J.J.; Sklar, D.; Stansell, T.A.; Wang, C.C.; Yi, S.K.
2006-01-01
Detailed design of the modernized LI civil signal (L1C) signal has been completed, and the resulting draft Interface Specification IS-GPS-800 was released in Spring 2006. The novel characteristics of the optimized L1C signal design provide advanced capabilities while offering to receiver designers considerable flexibility in how to use these capabilities. L1C provides a number of advanced features, including: 75% of power in a pilot component for enhanced signal tracking, advanced Weilbased spreading codes, an overlay code on the pilot that provides data message synchronization, support for improved reading of clock and ephemeris by combining message symbols across messages, advanced forward error control coding, and data symbol interleaving to combat fading. The resulting design offers receiver designers the opportunity to obtain unmatched performance in many ways. This paper describes the design of L1C. A summary of LIC's background and history is provided. The signal description then proceeds with the overall signal structure consisting of a pilot component and a carrier component. The new L1C spreading code family is described, along with the logic used for generating these spreading codes. Overlay codes on the pilot channel are also described, as is the logic used for generating the overlay codes. Spreading modulation characteristics are summarized. The data message structure is also presented, showing the format for providing time, ephemeris, and system data to users, along with features that enable receivers to perform code combining. Encoding of rapidly changing time bits is described, as are the Low Density Parity Check codes used for forward error control of slowly changing time bits, clock, ephemeris, and system data. The structure of the interleaver is also presented. A summary of L 1C's unique features and their benefits is provided, along with a discussion of the plan for L1C implementation.
Investigation of aged hot-mix asphalt pavements : technical summary.
DOT National Transportation Integrated Search
2013-09-01
Over the lifetime of an asphalt concrete (AC) pavement, the roadway requires periodic resurfacing and rehabilitation to provide acceptable performance. The most popular resurfacing method is an asphalt overlay over the existing roadway. In the design...
Geosynthetic materials in reflective crack prevention.
DOT National Transportation Integrated Search
2007-07-01
Reflective cracking due to shrinkage and brittleness in asphalt pavements can seriously degrade an asphalt overlay : before it is near the end of its design life. Geosynthetics have been used to impede the reflection of existing : transverse cracking...
Accelerated testing for studying pavement design and performance (FY 2004) : research summary.
DOT National Transportation Integrated Search
2009-03-01
The thirteenth full-scale Accelerated Pavement Test (APT) experiment at the Civil Infrastructure Laboratory (CISL) of Kansas State University aimed to determine the response and the failure mode of thin concrete overlays.
Geosynthetics for reflective crack control
DOT National Transportation Integrated Search
1999-03-01
Reflective cracking due to shrinkage and brittleness in asphalt pavements can seriously degrade an asphalt overlay before it is near its design life. Geosynthetics have been used to impede the reflection of existing transverse cracking to the new ove...
Development of improved overlay thickness design alternatives for local roads.
DOT National Transportation Integrated Search
2015-07-01
In this research study, 20 pavement sections were selected from six counties in Illinois, with varying : structural and traffic characteristics. Falling weight deflectometer (FWD) tests were conducted on these : road segments to determine and monitor...
DOT National Transportation Integrated Search
1986-01-01
The multiple-layer polymer concrete overlay on the Big Swan Creek Bridge was soundly bonded to the base concrete and providing excellent protection against the infiltration of chloride ions after 2 years in service. Evaluations of this and PC overlay...
DOT National Transportation Integrated Search
1982-01-01
The installation of a thin polymer concrete overlay on the Beulah Road bridge demonstrates that an overlay of low permeability and high skid resistance can be successfully installed by maintenance forces with a minimum of disruption to traffic, appro...
Complete Imageless solution for overlay front-end manufacturing
NASA Astrophysics Data System (ADS)
Herisson, David; LeCacheux, Virginie; Touchet, Mathieu; Vachellerie, Vincent; Lecarpentier, Laurent; Felten, Franck; Polli, Marco
2005-09-01
Imageless option of KLA-Tencor RDM system (Recipe Data Management) is a new method of recipe creation, using only the mask design to define alignment target and measurement parameters. This technique is potentially the easiest tool to improve recipe management of a large amount of products in logic fab. Overlay recipes are created without wafer, by using a synthetic image (copy of gds mask file) for alignment pattern and target design like shape (frame in frame) and size for the measurement. A complete gauge study on critical CMOS 90nm Gate level has been conducted to evaluate reliability and robustness of the imageless recipe. We show that Imageless limits drastically the number of templates used for recipe creation, and improves or maintains measurement capability compare to manual recipe creation (operator dependant). Imageless appears to be a suitable solution for high volume manufacturing, as shown by the results obtained on production lots.
Diffusion Barriers to Increase the Oxidative Life of Overlay Coatings
NASA Technical Reports Server (NTRS)
Nesbitt, James A.; Lei, Jih-Fen
1999-01-01
Currently, most blades and vanes in the hottest section of aero gas turbine engines require some type of coating for oxidation protection. Newly developed single crystal superalloys have the mechanical potential to operate at increasingly higher component temperatures. However, at these elevated temperatures, coating/substrate interdiffusion can shorten the protective life of the coating. Diffusion barriers between overlay coatings and substrates are being examined to extend the protective life of the coating. A previously- developed finite-difference diffusion model has been modified to predict the oxidative life enhancement due to use of a diffusion barrier. The original diffusion model, designated COSIM, simulates Al diffusion in the coating to the growing oxide scale as well as Al diffusion into the substrate. The COSIM model incorporates an oxide growth and spalling model to provide the rate of Al consumption during cyclic oxidation. Coating failure is predicted when the Al concentration at the coating surface drops to a defined critical level. The modified COSIM model predicts the oxidative life of an overlay coating when a diffusion barrier is present eliminating diffusion of Al from the coating into the substrate. Both the original and the modified diffusion models have been used to predict the effectiveness of a diffusion barrier in extending the protective life of a NiCrAl overlay coating undergoing cyclic oxidation at 1100 C.
Thermo-Mechanical Analysis of a Single-Pass Weld Overlay and Girth Welding in Lined Pipe
NASA Astrophysics Data System (ADS)
Obeid, Obeid; Alfano, Giulio; Bahai, Hamid
2017-08-01
The paper presents a nonlinear heat-transfer and mechanical finite-element (FE) analyses of a two-pass welding process of two segments of lined pipe made of a SUS304 stainless steel liner and a C-Mn steel pipe. The two passes consist of the single-pass overlay welding (inner lap weld) of the liner with the C-Mn steel pipe for each segment and the single-pass girth welding (outer butt weld) of the two segments. A distributed power density of the moving welding torch and a nonlinear heat-transfer coefficient accounting for both radiation and convection have been used in the analysis and implemented in user subroutines for the FE code ABAQUS. The modeling procedure has been validated against previously published experimental results for stainless steel and carbon steel welding separately. The model has been then used to determine the isotherms induced by the weld overlay and the girth welding and to clarify their influence on the transient temperature field and residual stress in the lined pipe. Furthermore, the influence of the cooling time between weld overlay and girth welding and of the welding speed have been examined thermally and mechanically as they are key factors that can affect the quality of lined pipe welding.
Improving P2P live-content delivery using SVC
NASA Astrophysics Data System (ADS)
Schierl, T.; Sánchez, Y.; Hellge, C.; Wiegand, T.
2010-07-01
P2P content delivery techniques for video transmission have become of high interest in the last years. With the involvement of client into the delivery process, P2P approaches can significantly reduce the load and cost on servers, especially for popular services. However, previous studies have already pointed out the unreliability of P2P-based live streaming approaches due to peer churn, where peers may ungracefully leave the P2P infrastructure, typically an overlay networks. Peers ungracefully leaving the system cause connection losses in the overlay, which require repair operations. During such repair operations, which typically take a few roundtrip times, no data is received from the lost connection. While taking low delay for fast-channel tune-in into account as a key feature for broadcast-like streaming applications, the P2P live streaming approach can only rely on a certain media pre-buffer during such repair operations. In this paper, multi-tree based Application Layer Multicast as a P2P overlay technique for live streaming is considered. The use of Flow Forwarding (FF), a.k.a. Retransmission, or Forward Error Correction (FEC) in combination with Scalable video Coding (SVC) for concealment during overlay repair operations is shown. Furthermore the benefits of using SVC over the use of AVC single layer transmission are presented.
Zanardi, Piero Rocha; Santos, Mayara Silva; Stegun, Roberto Chaib; Sesma, Newton; Costa, Bruno; Laganá, Dalva Cruz
2016-10-01
The process of tooth loss throughout life associated with severe occlusal wear may pose a challenge in the rehabilitation of partially edentulous arches. In these cases, many therapeutic procedures are necessary because each tooth must be restored to obtain the correct anatomical contour and recover the occlusal vertical dimension (OVD). A removable partial denture (RPD) with occlusal/incisal coverage, also known as an overlay RPD, is an alternative treatment option with fewer interventions, and, consequently, lower cost. This clinical report reviews the principles involved in the clinical indication for an overlay RPD, as well as the necessary planning and execution, to discuss the feasibility and clinical effectiveness of this treatment, identifying the indications, advantages, and disadvantages of this procedure through the presentation of a clinical case. The overlay RPD can be an alternative treatment for special situations involving partially edentulous arches in patients who need reestablishment of the OVD and/or realignment of the occlusal plane, and it can be used as a temporary or definitive treatment. The main advantages of this type of treatment are its simplicity, reversibility, and relatively low cost; however, further studies are needed to ensure the efficacy of this treatment option. © 2015 by the American College of Prosthodontists.
Ablative overlays for Space Shuttle leading edge ascent heat protection
NASA Technical Reports Server (NTRS)
Strauss, E. L.
1975-01-01
Ablative overlays were evaluated via a plasma-arc simulation of the ascent pulse on the leading edge of the Space Shuttle Orbiter. Overlay concepts included corkboard, polyisocyanurate foam, low-density Teflon, epoxy, and subliming salts. Their densities ranged from 4.9 to 81 lb per cu ft, and the thicknesses varied from 0.107 to 0.330 in. Swept-leading-edge models were fabricated from 30-lb per cu ft silicone-based ablators. The overlays were bonded to maintain the surface temperature of the base ablator below 500 F during ascent. Foams provided minimum-weight overlays, and subliming salts provided minimum-thickness overlays. Teflon left the most uniform surface after ascent heating.
NASA Astrophysics Data System (ADS)
Mukhtar, Maseeh; Thiel, Bradley
2018-03-01
In fabrication, overlay measurements of semiconductor device patterns have conventionally been performed using optical methods. Beginning with image-based techniques using box-in-box to the more recent diffraction-based overlay (DBO). Alternatively, use of SEM overlay is under consideration for in-device overlay. Two main application spaces are measurement features from multiple mask levels on the same surface and buried features. Modern CD-SEMs are adept at measuring overlay for cases where all features are on the surface. In order to measure overlay of buried features, HV-SEM is needed. Gate-to-fin and BEOL overlay are important use cases for this technique. A JMONSEL simulation exercise was performed for these two cases using 10 nm line/space gratings of graduated increase in depth of burial. Backscattered energy loss results of these simulations were used to calculate the sensitivity measurements of buried features versus electron dosage for an array of electron beam voltages.
DOT National Transportation Integrated Search
1984-01-01
The installation of a thin polymer concrete overlay on the Big Swan Creek Bridge provides further evidence that an overlay of low permeability can be soundly bonded to a concrete bridge deck by maintenance forces with a minimum of disruption to traff...
DOT National Transportation Integrated Search
1983-01-01
An evaluation of the thin polymer concrete overlay placed on the Beulah Road bridge indicates that the overlay is securely bonded to the base concrete and is providing low permeability and high skid resistance after 1 year of service life. The lane c...
Vision-based overlay of a virtual object into real scene for designing room interior
NASA Astrophysics Data System (ADS)
Harasaki, Shunsuke; Saito, Hideo
2001-10-01
In this paper, we introduce a geometric registration method for augmented reality (AR) and an application system, interior simulator, in which a virtual (CG) object can be overlaid into a real world space. Interior simulator is developed as an example of an AR application of the proposed method. Using interior simulator, users can visually simulate the location of virtual furniture and articles in the living room so that they can easily design the living room interior without placing real furniture and articles, by viewing from many different locations and orientations in real-time. In our system, two base images of a real world space are captured from two different views for defining a projective coordinate of object 3D space. Then each projective view of a virtual object in the base images are registered interactively. After such coordinate determination, an image sequence of a real world space is captured by hand-held camera with tracking non-metric measured feature points for overlaying a virtual object. Virtual objects can be overlaid onto the image sequence by taking each relationship between the images. With the proposed system, 3D position tracking device, such as magnetic trackers, are not required for the overlay of virtual objects. Experimental results demonstrate that 3D virtual furniture can be overlaid into an image sequence of the scene of a living room nearly at video rate (20 frames per second).
A map overlay error model based on boundary geometry
Gaeuman, D.; Symanzik, J.; Schmidt, J.C.
2005-01-01
An error model for quantifying the magnitudes and variability of errors generated in the areas of polygons during spatial overlay of vector geographic information system layers is presented. Numerical simulation of polygon boundary displacements was used to propagate coordinate errors to spatial overlays. The model departs from most previous error models in that it incorporates spatial dependence of coordinate errors at the scale of the boundary segment. It can be readily adapted to match the scale of error-boundary interactions responsible for error generation on a given overlay. The area of error generated by overlay depends on the sinuosity of polygon boundaries, as well as the magnitude of the coordinate errors on the input layers. Asymmetry in boundary shape has relatively little effect on error generation. Overlay errors are affected by real differences in boundary positions on the input layers, as well as errors in the boundary positions. Real differences between input layers tend to compensate for much of the error generated by coordinate errors. Thus, the area of change measured on an overlay layer produced by the XOR overlay operation will be more accurate if the area of real change depicted on the overlay is large. The model presented here considers these interactions, making it especially useful for estimating errors studies of landscape change over time. ?? 2005 The Ohio State University.
Human/Computer Interfacing in Educational Environments.
ERIC Educational Resources Information Center
Sarti, Luigi
1992-01-01
This discussion of educational applications of user interfaces covers the benefits of adopting database techniques in organizing multimedia materials; the evolution of user interface technology, including teletype interfaces, analogic overlay graphics, window interfaces, and adaptive systems; application design problems, including the…
Geosynthetics for reflective crack control : construction report.
DOT National Transportation Integrated Search
1999-03-01
Reflective cracking due to shrinkage and brittleness in asphalt pavements can seriously degrade an asphalt overlay before it is near its design life. Geosynthetics have been used to impede the reflection of existing transverse cracking to the new ove...
Performance life of HMA mixes : final report.
DOT National Transportation Integrated Search
2016-01-01
A number of hot mix asphalt (HMA) types, such as permeable friction course (PFC), stone mastic asphalts : (SMA), performance design mixes and conventional dense graded mixes are currently used to construct or overlay : roads. One of the important inp...
Design of a monitor and simulation terminal (master) for space station telerobotics and telescience
NASA Technical Reports Server (NTRS)
Lopez, L.; Konkel, C.; Harmon, P.; King, S.
1989-01-01
Based on Space Station and planetary spacecraft communication time delays and bandwidth limitations, it will be necessary to develop an intelligent, general purpose ground monitor terminal capable of sophisticated data display and control of on-orbit facilities and remote spacecraft. The basic elements that make up a Monitor and Simulation Terminal (MASTER) include computer overlay video, data compression, forward simulation, mission resource optimization and high level robotic control. Hardware and software elements of a MASTER are being assembled for testbed use. Applications of Neural Networks (NNs) to some key functions of a MASTER are also discussed. These functions are overlay graphics adjustment, object correlation and kinematic-dynamic characterization of the manipulator.
NASA Technical Reports Server (NTRS)
Rochlis-Zumbado, Jennifer; Sandor, Aniko; Ezer, Neta
2012-01-01
Risk of Inadequate Design of Human and Automation/Robotic Integration (HARI) is a new Human Research Program (HRP) risk. HRI is a research area that seeks to understand the complex relationship among variables that affect the way humans and robots work together to accomplish goals. The DRP addresses three major HRI study areas that will provide appropriate information for navigation guidance to a teleoperator of a robot system, and contribute to the closure of currently identified HRP gaps: (1) Overlays -- Use of overlays for teleoperation to augment the information available on the video feed (2) Camera views -- Type and arrangement of camera views for better task performance and awareness of surroundings (3) Command modalities -- Development of gesture and voice command vocabularies
DOT National Transportation Integrated Search
1987-01-01
This interim report presents the results after 5 years of a study undertaken to evaluate multiple layer polymer concrete overlays over a 10-year period. The report indicates that an overlay of low permeability and high skid resistance can be successf...
CHAM: weak signals detection through a new multivariate algorithm for process control
NASA Astrophysics Data System (ADS)
Bergeret, François; Soual, Carole; Le Gratiet, B.
2016-10-01
Derivatives technologies based on core CMOS processes are significantly aggressive in term of design rules and process control requirements. Process control plan is a derived from Process Assumption (PA) calculations which result in a design rule based on known process variability capabilities, taking into account enough margin to be safe not only for yield but especially for reliability. Even though process assumptions are calculated with a 4 sigma known process capability margin, efficient and competitive designs are challenging the process especially for derivatives technologies in 40 and 28nm nodes. For wafer fab process control, PA are declined in monovariate (layer1 CD, layer2 CD, layer2 to layer1 overlay, layer3 CD etc….) control charts with appropriated specifications and control limits which all together are securing the silicon. This is so far working fine but such system is not really sensitive to weak signals coming from interactions of multiple key parameters (high layer2 CD combined with high layer3 CD as an example). CHAM is a software using an advanced statistical algorithm specifically designed to detect small signals, especially when there are many parameters to control and when the parameters can interact to create yield issues. In this presentation we will first present the CHAM algorithm, then the case-study on critical dimensions, with the results, and we will conclude on future work. This partnership between Ippon and STM is part of E450LMDAP, European project dedicated to metrology and lithography development for future technology nodes, especially 10nm.
Development of Targeting UAVs Using Electric Helicopters and Yamaha RMAX
2007-05-17
including the QNX real - time operating system . The video overlay board is useful to display the onboard camera’s image with important information such as... real - time operating system . Fully utilizing the built-in multi-processing architecture with inter-process synchronization and communication
High Voltage Insulation Technology
NASA Astrophysics Data System (ADS)
Scherb, V.; Rogalla, K.; Gollor, M.
2008-09-01
In preparation of new Electronic Power Conditioners (EPC's) for Travelling Wave Tub Amplifiers (TWTA's) on telecom satellites a study for the development of new high voltage insulation technology is performed. The initiative is mandatory to allow compact designs and to enable higher operating voltages. In a first task a market analysis was performed, comparing different materials with respect to their properties and processes. A hierarchy of selection criteria was established and finally five material candidates (4 Epoxy resins and 1 Polyurethane resin) were selected to be further investigated in the test program. Samples for the test program were designed to represent core elements of an EPC, the high voltage transformer and Printed Circuit Boards of the high voltage section. All five materials were assessed in the practical work flow of the potting process and electrical, mechanical, thermal and lifetime testing was performed. Although the lifetime tests results were overlayed by a larges scatter, finally two candidates have been identified for use in a subsequent qualification program. This activity forms part of element 5 of the ESA ARTES Programme.
Enhancing The Army Operations Process Through The Incorportation of Holography
2017-06-09
the process and gives the user the sense of a noninvasive enhancement to quickly make decisions . Processes and information no longer create...mentally overlaying it onto the process . Data now augments reality and is a noninvasive process to decision making . v ACKNOWLEDGMENTS This paper...environment, augmented on top of reality decreases the amount of time needed to make decisions
The design of a tactical situation display
NASA Astrophysics Data System (ADS)
Kuperman, Gilbert G.; Wilson, Denise L.
The design and demonstration of a dynamic tactical situation display applicable to an advanced conceptual bomber crew system is discussed. The display is the primary source of mission pacing and situational awareness information in the Strategic Avionics Battle-Management Evaluation and Research (SABER) simulator. Aspects of the display design are described, including primary data items, horizontal situation display, point of interest indication, terrain data, graphics overlay, text window, and presentation modes.
Ulman, Kanchan; Nguyen, Manh-Thuong; Seriani, Nicola; Gebauer, Ralph
2016-03-07
There is a big debate in the community regarding the role of surface states of hematite in the photoelectrochemical water splitting. Experimental studies on non-catalytic overlayers passivating the hematite surface states claim a favorable reduction in the overpotential for the water splitting reaction. As a first step towards understanding the effect of these overlayers, we have studied the system Ga2O3 overlayers on hematite (0001) surfaces using first principles computations in the PBE+U framework. Our computations suggest that stoichiometric terminations of Ga2O3 overlayers are energetically more favored than the bare surface, at ambient oxygen chemical potentials. Energetics suggest that the overlayers prefer to grow via a layer-plus-island (Stranski-Krastanov) growth mode with a critical layer thickness of 1-2 layers. Thus, a complete wetting of the hematite surface by an overlayer of gallium oxide is thermodynamically favored. We establish that the effect of deposition of the Ga2O3 overlayers on the bare hematite surface is to passivate the surface states for the stoichiometric termination. For the oxygen terminated surface which is the most stable termination under photoelectrochemical conditions, the effect of deposition of the Ga2O3 overlayer is to passivate the hole-trapping surface state.
Installation and performance of lightweight aggregate asphaltic concrete test sections.
DOT National Transportation Integrated Search
1970-01-01
In 1966 and 1968 test sections of asphaltic concrete overlays fabricated with coarse lightweight aggregate and fine limestone were installed in the Roanoke-Bedford area. The experimental mixes used were designed in an attempt to develop skid resistan...
Assessment of asphalt interlayer designed on jointed concrete : [tech transfer summary].
DOT National Transportation Integrated Search
2014-11-01
Based on the substantial reduction in reflective cracking and only marginal : cost increases from using the interlayer on this research project, it is : recommended that future hot mix asphalt (HMA) overlay projects in Iowa : consider using the crack...
Two Dimensional Array Based Overlay Network for Balancing Load of Peer-to-Peer Live Video Streaming
NASA Astrophysics Data System (ADS)
Faruq Ibn Ibrahimy, Abdullah; Rafiqul, Islam Md; Anwar, Farhat; Ibn Ibrahimy, Muhammad
2013-12-01
The live video data is streaming usually in a tree-based overlay network or in a mesh-based overlay network. In case of departure of a peer with additional upload bandwidth, the overlay network becomes very vulnerable to churn. In this paper, a two dimensional array-based overlay network is proposed for streaming the live video stream data. As there is always a peer or a live video streaming server to upload the live video stream data, so the overlay network is very stable and very robust to churn. Peers are placed according to their upload and download bandwidth, which enhances the balance of load and performance. The overlay network utilizes the additional upload bandwidth of peers to minimize chunk delivery delay and to maximize balance of load. The procedure, which is used for distributing the additional upload bandwidth of the peers, distributes the additional upload bandwidth to the heterogeneous strength peers in a fair treat distribution approach and to the homogeneous strength peers in a uniform distribution approach. The proposed overlay network has been simulated by Qualnet from Scalable Network Technologies and results are presented in this paper.
Analytical study on web deformation by tension in roll-to-roll printing process
NASA Astrophysics Data System (ADS)
Kang, Y. S.; Hong, M. S.; Lee, S. H.; Jeon, Y. H.; Kang, D.; Lee, N. K.; Lee, M. G.
2017-08-01
Recently, flexible devices have gained high intentions for flexible display, Radio Frequency Identification (RFID), bio-sensor and so on. For manufacturing of the flexible devices, roll-to-roll process is a good candidate because of its low production cost and high productivity. Flexible substrate has a non-uniform deformation distribution by tension. Because the roll-to-roll process carries out a number of overlay printing processes, the deformation affect overlay printing precision and printable areas. In this study, the deformation of flexible substrate was analyzed by using finite element analysis and it was verified through experiments. More deformation occurred in the middle region in the direction parallel to rolling of the flexible substrate. It is confirmed through experiments and analysis that deformation occurs less at the both ends than in the middle region. Based on these results, a hourglass roll is proposed as a mechanical design of the roll to compensate the non-uniform deformation of the flexible substrate. In the hourglass roll, high stiffness material is used in the core and low stiffness material such as an elastic material is wrapped. The diameter of the core roll was designed to be the minimum at the middle and the maximum at both ends. We tried to compensate the non-uniform deformation distribution of the flexible substrate by using the variation of the contact stiffness between the roll and the flexible substrate. Deformation distribution of flexible substrates was confirmed by finite element analysis by applying hourglass roll shape. In the analysis when using the hourglass roll, it is confirmed that the stress distribution is compensated by about 70% and the strain distribution is compensated by about 67% compared to the case using the hourglass roll. To verify the compensation of the non-uniform deformation distribution due to the tension, deformation measurement experiment when using the proposed hourglass roll was carried out. Experiments have shown that the distribution of deformation is compensated by about 34%. From the results, we verified the performance of the proposed.
Suttle, Catherine M; Lawrenson, John G; Conway, Miriam L
2018-04-06
Coloured overlays or lenses are widely available for use by children and adults with difficulties or discomfort while reading. In recent years, systematic reviews have been conducted in an attempt to establish the strength of the evidence base for this intervention. The aim of this overview is to systematically review these reviews. The methodology was published prospectively as a protocol (Prospero CRD42017059172). Online databases Medline, Cinahl, Embase and the Cochrane Library were searched for systematic reviews on the efficacy of coloured overlays or lenses for the alleviation of reading difficulty or discomfort. Included studies were appraised using the AMSTAR 2 checklist. Characteristics of included studies such as aspects of methods, results and conclusions were recorded. Both processes were conducted independently by two reviewers and any discrepancies were resolved by discussion. Thirty-one studies were found via databases and other sources. After excluding duplicates and those not fitting the inclusion criteria, four reviews were included in the analysis. While all reviews were systematic, their methodology, results and conclusions differed. Three of the four concluded that there is insufficient good quality evidence to support the use of coloured overlays or lenses for reading difficulty, while one concluded that, despite research limitations, the evidence does support their use. On balance, systematic reviews to date indicate that there is not yet a reliable evidence base on which to recommend coloured overlays or lenses for the alleviation of reading difficulty or discomfort. High quality, low bias research is needed to investigate their effectiveness in different forms of reading difficulty and discomfort for adults and children. © 2018 Optometry Australia.
Bandwidth auction for SVC streaming in dynamic multi-overlay
NASA Astrophysics Data System (ADS)
Xiong, Yanting; Zou, Junni; Xiong, Hongkai
2010-07-01
In this paper, we study the optimal bandwidth allocation for scalable video coding (SVC) streaming in multiple overlays. We model the whole bandwidth request and distribution process as a set of decentralized auction games between the competing peers. For the upstream peer, a bandwidth allocation mechanism is introduced to maximize the aggregate revenue. For the downstream peer, a dynamic bidding strategy is proposed. It achieves maximum utility and efficient resource usage by collaborating with a content-aware layer dropping/adding strategy. Also, the convergence of the proposed auction games is theoretically proved. Experimental results show that the auction strategies can adapt to dynamic join of competing peers and video layers.
CFDP for Interplanetary Overlay Network
NASA Technical Reports Server (NTRS)
Burleigh, Scott C.
2011-01-01
The CCSDS (Consultative Committee for Space Data Systems) File Delivery Protocol for Interplanetary Overlay Network (CFDP-ION) is an implementation of CFDP that uses IO' s DTN (delay tolerant networking) implementation as its UT (unit-data transfer) layer. Because the DTN protocols effect automatic, reliable transmission via multiple relays, CFDP-ION need only satisfy the requirements for Class 1 ("unacknowledged") CFDP. This keeps the implementation small, but without loss of capability. This innovation minimizes processing resources by using zero-copy objects for file data transmission. It runs without modification in VxWorks, Linux, Solaris, and OS/X. As such, this innovation can be used without modification in both flight and ground systems. Integration with DTN enables the CFDP implementation itself to be very simple; therefore, very small. Use of ION infrastructure minimizes consumption of storage and processing resources while maximizing safety.
Poulias, Evmenios; Greenwell, Henry; Hill, Margaret; Morton, Dean; Vidal, Ricardo; Shumway, Brian; Peterson, Thomas L
2013-11-01
Previous studies of ridge preservation showed a loss of ≈18% or 1.5 mm of crestal ridge width in spite of treatment. The primary aim of this randomized, controlled, masked clinical trial is to compare a socket graft to the same treatment plus a buccal overlay graft, both with a polylactide membrane, to determine if loss of ridge width can be prevented by use of an overlay graft. Twelve patients who served as positive controls received an intrasocket mineralized cancellous allograft (socket group), and 12 patients received the same socket graft procedure plus buccal overlay cancellous xenograft (overlay group). Horizontal ridge dimensions were measured with a digital caliper, and vertical ridge changes were measured from a stent. Before implant placement, at 4 months, a trephine core was obtained for histologic analysis. The mean horizontal ridge width at the crest for the socket group decreased from 8.7 ± 1.0 to 7.1 ± 1.5 mm for a mean loss of 1.6 ± 0.8 mm (P <0.05), whereas the same measurement for the overlay group decreased from 8.4 ± 1.4 to 8.1 ± 1.4 mm for a mean loss of 0.3 ± 0.9 mm (P >0.05). The overlay group was significantly different from the socket group (P <0.05). Histologic analysis revealed that the socket group had 35% ± 16% vital bone, and the overlay group had 40% ± 16% (P >0.05). The overlay treatment significantly prevented loss of ridge width and preserved or augmented the buccal contour. The socket and overlay groups healed with a high percentage of vital bone.
A slotted cathodic protection system for bridge decks.
DOT National Transportation Integrated Search
1985-01-01
A non-overlay, slotted cathodic protection system was installed two years ago on a concrete bridge deck in Virginia. The design, installation, and operation of this system are fairly straightforward. A protective current density of 1.6 mA/ft (17 mA...
DOT National Transportation Integrated Search
2012-10-01
Presently, one of the principal performance concerns of hot-mix asphalt (HMA) pavements is premature : cracking, particularly of HMA surfacing mixes. Regrettably, however, while many USA transportation agencies have : implemented design-level tests t...
Teleseminars and Teacher Education. Research Report.
ERIC Educational Resources Information Center
Edwards, Peter; Sofo, Frank
This exploratory study developed instructional materials designed to maximize learning through individual and group interaction and used the materials to examine the effectiveness of a teleseminar approach for interactive distance presentations. In this teleseminar model, duplicate sets of overhead transparencies with overlays and other materials…
Improved overlay tester for fatigue cracking resistance of asphalt mixtures.
DOT National Transportation Integrated Search
2017-01-01
Premature cracking of the asphalt concrete (AC) layer in flexible pavement is one of the major concerns of the pavement community. Over the past decade, AC mixes have been designed using the Hamburg wheel-tracking device to improve their rutting pote...
DOT National Transportation Integrated Search
2015-02-01
The ability to efficiently rehabilitate and maintain the State of Vermonts Highway infrastructure in a : cost-effective manner is a daunting task. Historically, pavement overlay treatments were specified : because it was a rapid low cost solution ...
GoDisco: Selective Gossip Based Dissemination of Information in Social Community Based Overlays
NASA Astrophysics Data System (ADS)
Datta, Anwitaman; Sharma, Rajesh
We propose and investigate a gossip based, social principles and behavior inspired decentralized mechanism (GoDisco) to disseminate information in online social community networks, using exclusively social links and exploiting semantic context to keep the dissemination process selective to relevant nodes. Such a designed dissemination scheme using gossiping over a egocentric social network is unique and is arguably a concept whose time has arrived, emulating word of mouth behavior and can have interesting applications like probabilistic publish/subscribe, decentralized recommendation and contextual advertisement systems, to name a few. Simulation based experiments show that despite using only local knowledge and contacts, the system has good global coverage and behavior.
Bourke, Levi; Blaikie, Richard J
2017-12-01
Dielectric waveguide resonant underlayers are employed in ultra-high NA interference photolithography to effectively double the depth of field. Generally a single high refractive index waveguiding layer is employed. Here multilayer Herpin effective medium methods are explored to develop equivalent multilayer waveguiding layers. Herpin equivalent resonant underlayers are shown to be suitable replacements provided at least one layer within the Herpin trilayer supports propagating fields. In addition, a method of increasing the intensity incident upon the photoresist using resonant overlayers is also developed. This method is shown to greatly enhance the intensity within the photoresist making the use of thicker, safer, non-absorbing, low refractive index matching liquids potentially suitable for large-scale applications.
CFD-Predicted Tile Heating Bump Factors Due to Tile Overlay Repairs
NASA Technical Reports Server (NTRS)
Lessard, Victor R.
2006-01-01
A Computational Fluid Dynamics investigation of the Orbiter's Tile Overlay Repair (TOR) is performed to assess the aeroheating Damage Assessment Team's (DAT) existing heating correlation method for protuberance interference heating on the surrounding thermal protection system. Aerothermodynamic heating analyses are performed for TORs at the design reference damage locations body points 1800 and 1075 for a Mach 17.9 and a=39deg STS-107 flight trajectory point with laminar flow. Six different cases are considered. The computed peak heating bump factor on the surrounding tiles are below the DAT's heating bump factor values for smooth tile cases. However, for the uneven tiles cases the peak interference heating is shown to be considerably higher than the existing correlation prediction.
Type A polymer concrete overlay field trials : final report.
DOT National Transportation Integrated Search
1984-12-01
This report describes placement and subsequent performance of two methyl methacrylate polymer concrete overlays. Performance is evaluated as to: 1) the mixing and placement characteristics of the methyl methacrylate polymer concretes as overlay mater...
Improved performance of JPCP overlays.
DOT National Transportation Integrated Search
2013-07-01
The overall performance of Michigan concrete overlays has been good. However, some recent JPCP overlay projects have developed premature distress with signs of pumping. It is suspected that lack of drainage was the main cause for the distresses rangi...
Tack coat optimization for HMA overlays laboratory testing.
DOT National Transportation Integrated Search
2008-09-01
Interface bonding between hot-mix asphalt (HMA) overlays and Portland cement concrete (PCC) pavements can be one of the most : significant factors affecting overlay service life. Various factors may affect the bonding condition at the interface, incl...
Very-Early-Strength Latex-Modified Concrete Overlays
DOT National Transportation Integrated Search
1998-12-01
This report describes the installation and condition of the first two very-early-strength latex-modified concrete (LMC-VE) overlays to be constructed for the Virginia Department of Transportation. The overlays were prepared with a special blended cem...
Very-early-strength latex-modified concrete overlay.
DOT National Transportation Integrated Search
1998-12-01
This paper describes the installation and condition of the first two very-early-strength latex modified concrete (LMC-VE) overlays constructed for the Virginia Department of Transportation. The overlays were prepared with a special blended cement rat...
1994-02-01
ash, silica-fume, polymer -modified, polymer , and fiber - reinforced concretes. For some nonstructural repairs, unbonded overlays have been employed in an...which silica fume was included; polymer -modified concrete overlay, one in which a polymer admixture had been included; and fiber - reinforced concrete...of pumps. However, a determination has not been made for the source of leakage. 56 Chapter 6 Polymer -Modified Concrete Overlays 7 Fiber - Reinforced
Accuracy optimization with wavelength tunability in overlay imaging technology
NASA Astrophysics Data System (ADS)
Lee, Honggoo; Kang, Yoonshik; Han, Sangjoon; Shim, Kyuchan; Hong, Minhyung; Kim, Seungyoung; Lee, Jieun; Lee, Dongyoung; Oh, Eungryong; Choi, Ahlin; Kim, Youngsik; Marciano, Tal; Klein, Dana; Hajaj, Eitan M.; Aharon, Sharon; Ben-Dov, Guy; Lilach, Saltoun; Serero, Dan; Golotsvan, Anna
2018-03-01
As semiconductor manufacturing technology progresses and the dimensions of integrated circuit elements shrink, overlay budget is accordingly being reduced. Overlay budget closely approaches the scale of measurement inaccuracies due to both optical imperfections of the measurement system and the interaction of light with geometrical asymmetries of the measured targets. Measurement inaccuracies can no longer be ignored due to their significant effect on the resulting device yield. In this paper we investigate a new approach for imaging based overlay (IBO) measurements by optimizing accuracy rather than contrast precision, including its effect over the total target performance, using wavelength tunable overlay imaging metrology. We present new accuracy metrics based on theoretical development and present their quality in identifying the measurement accuracy when compared to CD-SEM overlay measurements. The paper presents the theoretical considerations and simulation work, as well as measurement data, for which tunability combined with the new accuracy metrics is shown to improve accuracy performance.
D'Arcangelo, Camillo; De Angelis, Francesco; Vadini, Mirco; Carluccio, Fabio; Vitalone, Laura Merla; D'Amario, Maurizio
2012-08-01
To assess the microhardness of three resin composites employed in the adhesive luting of indirect composite restorations and examine the influence of the overlay material and thickness as well as the curing time on polymerization rate. Three commercially available resin composites were selected: Enamel Plus HRI (Micerium) (ENA), Saremco ELS (Saremco Dental) (SAR), Esthet-X HD (Dentsply/DeTrey) (EST-X). Post-polymerized cylinders of 6 different thicknesses were produced and used as overlays: 2 mm, 3 mm, 3.5 mm, 4 mm, 5 mm, and 6 mm. Two-mm-thick disks were produced and employed as underlays. A standardized amount of composite paste was placed between the underlay and the overlay surfaces which were maintained at a fixed distance of 0.5 mm. Light curing of the luting composite layer was performed through the overlays for 40, 80, or 120 s. For each specimen, the composite to be cured, the cured overlay, and the underlay were made out of the same batch of resin composite. All specimens were assigned to three experimental groups on the basis of the resin composite used, and to subgroups on the basis of the overlay thickness and the curing time, resulting in 54 experimental subgroups (n = 5). Forty-five additional specimens, 15 for each material under investigation, were produced and subjected to 40, 80, or 120 s of light curing using a microscope glass as an overlay; they were assigned to 9 control subgroups (n = 5). Three Vicker's hardness (VH) indentations were performed on each specimen. Means and standard deviations were calculated. Data were statistically analyzed using 3-way ANOVA. Within the same material, VH values lower than 55% of control were not considered acceptable. The used material, the overlay thickness, and the curing time significantly influenced VH values. In the ENA group, acceptable hardness values were achieved with 3.5-mm or thinner overlays after 120 or 80 s curing time (VH 41.75 and 39.32, respectively), and with 2-mm overlays after 40 s (VH 54.13). In the SAR group, acceptable hardness values were only achieved with 2-mm-thick overlays after 120 or 80 s curing time (VH 39.81 and 29.78, respectively). In the EST-X group, acceptable hardness values were only achieved with 3-mm or thinner overlays, after 120 or 80 s curing time (VH 36.20 and 36.03, respectively). Curing time, restoration thickness, and overlay material significantly influenced the microhardness of the tested resin composites employed as luting agents. The clinician should carefully keep these factors under control.
TxACOL workshop : Texas asphalt concrete overlay design and analysis system.
DOT National Transportation Integrated Search
2010-01-01
General Information: : -Two workshops were held respectively on Aug. 25 at Paris, Tx and on Oct. 6 at Austin, Tx, : -More than 30 representatives from TxDOT attended, : -Introduction of TxACOL software, key input parameters, and related lab and field...
Minami, Yasunori; Minami, Tomohiro; Hagiwara, Satoru; Ida, Hiroshi; Ueshima, Kazuomi; Nishida, Naoshi; Murakami, Takamichi; Kudo, Masatoshi
2018-05-01
To assess the clinical feasibility of US-US image overlay fusion with evaluation of the ablative margin in radiofrequency ablation (RFA) for hepatocellular carcinoma (HCC). Fifty-three patients with 68 HCCs measuring 0.9-4.0 cm who underwent RFA guided by US-US overlay image fusion were included in this retrospective study. By an overlay of pre-/postoperative US, the tumor image could be projected onto the ablative hyperechoic zone. Therefore, the ablative margin three-dimensionally could be shown during the RFA procedure. US-US image overlay was compared to dynamic CT a few days after RFA for assessment of early treatment response. Accuracy of graded response was calculated, and the performance of US-US image overlay fusion was compared with that of CT using a Kappa agreement test. Technically effective ablation was achieved in a single session, and 59 HCCs (86.8 %) succeeded in obtaining a 5-mm margin on CT. The response with US-US image overlay correctly predicted early CT evaluation with an accuracy of 92.6 % (63/68) (k = 0.67; 95 % CI: 0.39-0.95). US-US image overlay fusion can be proposed as a feasible guidance in RFA with a safety margin and predicts early response of treatment assessment with high accuracy. • US-US image overlay fusion visualizes the ablative margin during RFA procedure. • Visualizing the margin during the procedure can prompt immediate complementary treatment. • US image fusion correlates with the results of early evaluation CT.
Augmenting reality in Direct View Optical (DVO) overlay applications
NASA Astrophysics Data System (ADS)
Hogan, Tim; Edwards, Tim
2014-06-01
The integration of overlay displays into rifle scopes can transform precision Direct View Optical (DVO) sights into intelligent interactive fire-control systems. Overlay displays can provide ballistic solutions within the sight for dramatically improved targeting, can fuse sensor video to extend targeting into nighttime or dirty battlefield conditions, and can overlay complex situational awareness information over the real-world scene. High brightness overlay solutions for dismounted soldier applications have previously been hindered by excessive power consumption, weight and bulk making them unsuitable for man-portable, battery powered applications. This paper describes the advancements and capabilities of a high brightness, ultra-low power text and graphics overlay display module developed specifically for integration into DVO weapon sight applications. Central to the overlay display module was the development of a new general purpose low power graphics controller and dual-path display driver electronics. The graphics controller interface is a simple 2-wire RS-232 serial interface compatible with existing weapon systems such as the IBEAM ballistic computer and the RULR and STORM laser rangefinders (LRF). The module features include multiple graphics layers, user configurable fonts and icons, and parameterized vector rendering, making it suitable for general purpose DVO overlay applications. The module is configured for graphics-only operation for daytime use and overlays graphics with video for nighttime applications. The miniature footprint and ultra-low power consumption of the module enables a new generation of intelligent DVO systems and has been implemented for resolutions from VGA to SXGA, in monochrome and color, and in graphics applications with and without sensor video.
Cracking and debonding of a thin fiber reinforced concrete overlay.
DOT National Transportation Integrated Search
2017-04-01
Previous field studies suggested that macro-fibers incorporated in thin overlay pavements will result in reduced crack opening widths, vertical deflections, and debonding rates compared to that of unreinforced overlays. A simple finite element (FE) m...
High early strength latex modified concrete overlay.
DOT National Transportation Integrated Search
1988-01-01
This report describes the condition of the first high early strength latex modified concrete (LMC-HE) overlay to be constructed for the Virginia Department of Transportation. The overlay was prepared with type III cement and with more cement and less...
NASA Astrophysics Data System (ADS)
Cekli, Hakki Ergun; Nije, Jelle; Ypma, Alexander; Bastani, Vahid; Sonntag, Dag; Niesing, Henk; Zhang, Linmiao; Ullah, Zakir; Subramony, Venky; Somasundaram, Ravin; Susanto, William; Matsunobu, Masazumi; Johnson, Jeff; Tabery, Cyrus; Lin, Chenxi; Zou, Yi
2018-03-01
In addition to lithography process and equipment induced variations, processes like etching, annealing, film deposition and planarization exhibit variations, each having their own intrinsic characteristics and leaving an effect, a `fingerprint', on the wafers. With ever tighter requirements for CD and overlay, controlling these process induced variations is both increasingly important and increasingly challenging in advanced integrated circuit (IC) manufacturing. For example, the on-product overlay (OPO) requirement for future nodes is approaching <3nm, requiring the allowable budget for process induced variance to become extremely small. Process variance control is seen as an bottleneck to further shrink which drives the need for more sophisticated process control strategies. In this context we developed a novel `computational process control strategy' which provides the capability of proactive control of each individual wafer with aim to maximize the yield, without introducing a significant impact on metrology requirements, cycle time or productivity. The complexity of the wafer process is approached by characterizing the full wafer stack building a fingerprint library containing key patterning performance parameters like Overlay, Focus, etc. Historical wafer metrology is decomposed into dominant fingerprints using Principal Component Analysis. By associating observed fingerprints with their origin e.g. process steps, tools and variables, we can give an inline assessment of the strength and origin of the fingerprints on every wafer. Once the fingerprint library is established, a wafer specific fingerprint correction recipes can be determined based on its processing history. Data science techniques are used in real-time to ensure that the library is adaptive. To realize this concept, ASML TWINSCAN scanners play a vital role with their on-board full wafer detection and exposure correction capabilities. High density metrology data is created by the scanner for each wafer and on every layer during the lithography steps. This metrology data will be used to obtain the process fingerprints. Also, the per exposure and per wafer correction potential of the scanners will be utilized for improved patterning control. Additionally, the fingerprint library will provide early detection of excursions for inline root cause analysis and process optimization guidance.
The polarization of Sb overlayers on NiMnSb(100)
NASA Astrophysics Data System (ADS)
Komesu, Takashi; Borca, C. N.; Jeong, Hae-Kyung; Dowben, P. A.; Ristoiu, Delia; Nozières, J. P.; Stadler, Shane; Idzerda, Y. U.
2000-08-01
We have investigated the induced polarization of paramagnetic Sb overlayers on the Heusler alloy NiMnSb. From combined X-ray absorption spectroscopy (XAS) and spin-polarized inverse photoemission spectroscopy (SPIPES), we can assign some of the unoccupied states of the Heusler alloy NiMnSb. With increasing thickness of the Sb overlayer, there is a decline in the density of states near the Fermi energy, as expected for a semimetal overlayer on a metallic substrate. While the Sb is polarized by the ferromagnetic NiMnSb substrate, consistent with the expectations of mean field theory, the polarization at the center of the surface/overlayer Brillouin zone cannot be easily related to the induced magnetization.
Effect of a Dielectric Overlay on a Linearly Tapered Slot Antenna Excited by a Coplanar Waveguide
NASA Technical Reports Server (NTRS)
Simons, Rainee N.; Lee, Richard Q.; Perl, Thomas D.; Silvestro, John
1993-01-01
The effect of a dielectric overlay on a linearly tapered slot antenna (LTSA) is studied. The LTSA under study has very wide bandwidth and excellent radiation patterns. A dielectric overlay improves the patterns and directivity of the antenna by increasing the electrical length and effective aperture of the antenna. A dielectric overlay can also be used to reduce the physical length of the antenna without compromising the pattern quality.
Optimization of robotic welding procedures for maintenance repair of hydraulic turbines
DOE Office of Scientific and Technical Information (OSTI.GOV)
Lamarche, L.; Galopin, M.; Simoneau, R.
1996-12-31
A six axes super-compact robot is used for field repair of cavitation damages found on the discharge ring of hydraulic turbines. Optimization of overlay welding procedures to minimize surface distortion and reduce tearing forces on anchors in concrete, were studied through experimentation and FEM modelling. Planned experimentation has been used to develop optimum pulsed GMAW schedules of stainless steel overlays in 2G position. Best welding sequence was resolved through over lay welding of free plates. Each overlay consisted in one or two layers which were welded in the longitudinal and/or transverse direction of the rectangular plate. A bidirectional welding mode,more » a longitudinal layer followed by a transverse layer position and no cooling between the two layers, were found to be most effective in reducing distortion. The optimized 2G welding procedure was applied to a simulated field repair. Plate was anchored on a massive iron bracket with a set of instrumented bolts, to understand how normal tearing forces in anchors evolve. Preliminary results on FEM modelling of lateral force on anchors indicate good correlation with experiments, for an elementary design.« less
NASA Astrophysics Data System (ADS)
El Sachat, Alexandros; Meristoudi, Anastasia; Markos, Christos; Pispas, Stergios; Riziotis, Christos
2014-03-01
A low cost and low complexity optical detection method of proteins is presented by employing a detection scheme based on electrostatic interactions, and implemented by sensitization of a polymer optical fibers' (POF) surface by thin overlayers of properly designed sensitive copolymer materials with predesigned charges. This method enables the fast detection of proteins having opposite charge to the overlayer, and also the effective discrimination of differently charged proteins like lysozyme (LYS) and bovine serum albumin (BSA). As sensitive materials the block and the random copolymers of the same monomers were employed, namely the block copolymer poly(styrene-b-2vinylpyridine) (PS-b- P2VP) and the corresponding random copolymer poly(styrene-r-2vinylpyridine) (PS-r-P2VP), of similar composition and molecular weights. Results show systematically different response between the block and the random copolymers, although of the same order of magnitude, drawing thus important conclusions on their applications' techno-economic aspects given that they have significantly different associated manufacturing method and costs. The use of the POF platform, in combination with those adaptable copolymer sensing materials could lead to efficient low cost bio-detection schemes.
Factors affecting maintenance overlay ride quality : 1996 rideability status.
DOT National Transportation Integrated Search
1997-01-01
In early 1996, the Virginia Transportation Research Council initiated a formal analysis of the factors affecting overlay ride quality. As part of that effort, a statewide, multi-year survey of the ride quality for both new overlays and pavement await...
Tack coat optimization for HMA overlays : accelerated pavement test report.
DOT National Transportation Integrated Search
2009-02-01
Interface bonding between hot-mix asphalt (HMA) overlays and Portland cement concrete (PCC) pavements is one : of the most significant factors affecting overlay service life. This study was performed to quantify the effects of HMA type, : tack coat t...
Latex-modified fiber-reinforced concrete bridge deck overlay : construction/interim report.
DOT National Transportation Integrated Search
1993-06-01
Latex-modified concrete (LMC) is Portland cement concrete (PCC) with an admixture of latex. LMC is considered to be nearly impermeable to chlorides and is extensively used to construct bridge deck overlays. Unfortunately, some of these overlays have ...
Microsilica modified concrete for bridge deck overlays : second-year interim report.
DOT National Transportation Integrated Search
1994-10-01
This report summarizes the performance of microsilica concrete (MC) overlays on seven distressed portland cement concrete bridge decks at three sites in Oregon. This report emphasizes the overlays' condition after two, or in some cases, three years o...
Efficient hybrid metrology for focus, CD, and overlay
NASA Astrophysics Data System (ADS)
Tel, W. T.; Segers, B.; Anunciado, R.; Zhang, Y.; Wong, P.; Hasan, T.; Prentice, C.
2017-03-01
In the advent of multiple patterning techniques in semiconductor industry, metrology has progressively become a burden. With multiple patterning techniques such as Litho-Etch-Litho-Etch and Sidewall Assisted Double Patterning, the number of processing step have increased significantly and therefore, so as the amount of metrology steps needed for both control and yield monitoring. The amount of metrology needed is increasing in each and every node as more layers needed multiple patterning steps, and more patterning steps per layer. In addition to this, there is that need for guided defect inspection, which in itself requires substantially denser focus, overlay, and CD metrology as before. Metrology efficiency will therefore be cruicial to the next semiconductor nodes. ASML's emulated wafer concept offers a highly efficient method for hybrid metrology for focus, CD, and overlay. In this concept metrology is combined with scanner's sensor data in order to predict the on-product performance. The principle underlying the method is to isolate and estimate individual root-causes which are then combined to compute the on-product performance. The goal is to use all the information available to avoid ever increasing amounts of metrology.
Evaluation of maintenance/rehabilitation alternatives for continuously reinforced concrete pavement
NASA Astrophysics Data System (ADS)
Barnett, T. L.; Darter, M. I.; Laybourne, N. R.
1981-05-01
The design, construction, performance, and costs of several maintenance and rehabilitation methods were evaluated. Patching, cement grout and asphalt undersealing, epoxying of cracks, and an asphalt overlay were considered. Nondestructive testing, deflections, reflection cracking, cost, and statistical analyses were used to evaluate the methods.
Surface recycling Route US 71 : construction and initial evaluation.
DOT National Transportation Integrated Search
1986-08-01
Recently in Louisiana due to monetary constraints, typical overlay section design has been modified from a levelling and wearing course (3.5 inches) to cold milling (average 2 inch depth) and 1.5-2.0 inches of wearing course. Due to the five years of...
Assessment and prediction of drying shrinkage cracking in bonded mortar overlays
DOE Office of Scientific and Technical Information (OSTI.GOV)
Beushausen, Hans, E-mail: hans.beushausen@uct.ac.za; Chilwesa, Masuzyo
2013-11-15
Restrained drying shrinkage cracking was investigated on composite beams consisting of substrate concrete and bonded mortar overlays, and compared to the performance of the same mortars when subjected to the ring test. Stress development and cracking in the composite specimens were analytically modeled and predicted based on the measurement of relevant time-dependent material properties such as drying shrinkage, elastic modulus, tensile relaxation and tensile strength. Overlay cracking in the composite beams could be very well predicted with the analytical model. The ring test provided a useful qualitative comparison of the cracking performance of the mortars. The duration of curing wasmore » found to only have a minor influence on crack development. This was ascribed to the fact that prolonged curing has a beneficial effect on tensile strength at the onset of stress development, but is in the same time not beneficial to the values of tensile relaxation and elastic modulus. -- Highlights: •Parameter study on material characteristics influencing overlay cracking. •Analytical model gives good quantitative indication of overlay cracking. •Ring test presents good qualitative indication of overlay cracking. •Curing duration has little effect on overlay cracking.« less
Molecular dynamics simulations of sputtering of Langmuir-Blodgett multilayers by keV C60 projectiles
Paruch, R.; Rzeznik, L.; Czerwinski, B.; Garrison, B. J.; Winograd, N.; Postawa, Z.
2009-01-01
Coarse-grained molecular dynamics computer simulations are applied to investigate fundamental processes induced by an impact of keV C60 projectile at an organic overlayer composed of long, well-organized linear molecules. The energy transfer pathways, sputtering yields, and the damage induced in the irradiated system, represented by a Langmuir-Blodgett (LB) multilayers composed from molecules of bariated arachidic acid, are investigated as a function of the kinetic energy and impact angle of the projectile and the thickness of the organic system. In particular, the unique challenges of depth profiling through a LB film vs. a more isotropic solid are discussed. The results indicate that the trajectories of projectile fragments and, consequently, the primary energy can be channeled by the geometrical structure of the overlayer. Although, a similar process is known from sputtering of single crystals by atomic projectiles, it has not been anticipated to occur during C60 bombardment due to the large size of the projectile. An open and ordered molecular structure of LB films is responsible for such behavior. Both the extent of damage and the efficiency of sputtering depend on the kinetic energy, the impact angle, and the layer thickness. The results indicate that the best depth profiling conditions can be achieved with low-energy cluster projectiles irradiating the organic overlayer at large off-normal angles. PMID:20174461
Membrane Permeability of Fatty Acyl Compounds Studied via Molecular Simulation
Vermaas, Josh V.; Beckham, Gregg T.; Crowley, Michael F.
2017-10-17
Interest in fatty acid-derived products as fuel and chemical precursors has grown substantially. Microbes can be genetically engineered to produce fatty acid-derived products that are able to cross host membranes and can be extracted into an applied organic overlay. This process is thought to be passive, with a rate dependent on the chemistry of the crossing compound. The relationship between the chemical composition and the energetics and kinetics of product accumulation within the overlay is not well understood. Through biased and unbiased molecular simulation, we compute the membrane permeability coefficients from production to extraction for different fatty acyl products, includingmore » fatty acids, fatty alcohols, fatty aldehydes, alkanes, and alkenes. These simulations identify specific interactions that accelerate the transit of aldehydes across the membrane bilayer relative to other oxidized products, specifically the lack of hydrogen bonds to the surrounding membrane environment. However, since extraction from the outer membrane leaflet into the organic phase is found to be rate limiting for the entire process, we find that fatty alcohols and fatty aldehydes would both manifest similar fluxes into a dodecane overlay under equivalent conditions, outpacing the accumulation of acids or alkanes into the organic phase. Since aldehydes are known to be highly reactive as well as toxic in high quantities, the findings suggest that indeed fatty alcohols are the optimal long-tail fatty acyl product for extraction.« less
Membrane Permeability of Fatty Acyl Compounds Studied via Molecular Simulation.
Vermaas, Josh V; Beckham, Gregg T; Crowley, Michael F
2017-12-21
Interest in fatty acid-derived products as fuel and chemical precursors has grown substantially. Microbes can be genetically engineered to produce fatty acid-derived products that are able to cross host membranes and can be extracted into an applied organic overlay. This process is thought to be passive, with a rate dependent on the chemistry of the crossing compound. The relationship between the chemical composition and the energetics and kinetics of product accumulation within the overlay is not well understood. Through biased and unbiased molecular simulation, we compute the membrane permeability coefficients from production to extraction for different fatty acyl products, including fatty acids, fatty alcohols, fatty aldehydes, alkanes, and alkenes. These simulations identify specific interactions that accelerate the transit of aldehydes across the membrane bilayer relative to other oxidized products, specifically the lack of hydrogen bonds to the surrounding membrane environment. However, since extraction from the outer membrane leaflet into the organic phase is found to be rate limiting for the entire process, we find that fatty alcohols and fatty aldehydes would both manifest similar fluxes into a dodecane overlay under equivalent conditions, outpacing the accumulation of acids or alkanes into the organic phase. Since aldehydes are known to be highly reactive as well as toxic in high quantities, the findings suggest that indeed fatty alcohols are the optimal long-tail fatty acyl product for extraction.
Membrane Permeability of Fatty Acyl Compounds Studied via Molecular Simulation
DOE Office of Scientific and Technical Information (OSTI.GOV)
Vermaas, Josh V.; Beckham, Gregg T.; Crowley, Michael F.
Interest in fatty acid-derived products as fuel and chemical precursors has grown substantially. Microbes can be genetically engineered to produce fatty acid-derived products that are able to cross host membranes and can be extracted into an applied organic overlay. This process is thought to be passive, with a rate dependent on the chemistry of the crossing compound. The relationship between the chemical composition and the energetics and kinetics of product accumulation within the overlay is not well understood. Through biased and unbiased molecular simulation, we compute the membrane permeability coefficients from production to extraction for different fatty acyl products, includingmore » fatty acids, fatty alcohols, fatty aldehydes, alkanes, and alkenes. These simulations identify specific interactions that accelerate the transit of aldehydes across the membrane bilayer relative to other oxidized products, specifically the lack of hydrogen bonds to the surrounding membrane environment. However, since extraction from the outer membrane leaflet into the organic phase is found to be rate limiting for the entire process, we find that fatty alcohols and fatty aldehydes would both manifest similar fluxes into a dodecane overlay under equivalent conditions, outpacing the accumulation of acids or alkanes into the organic phase. Since aldehydes are known to be highly reactive as well as toxic in high quantities, the findings suggest that indeed fatty alcohols are the optimal long-tail fatty acyl product for extraction.« less
Human-Robot Interaction Directed Research Project
NASA Technical Reports Server (NTRS)
Rochlis, Jennifer; Ezer, Neta; Sandor, Aniko
2011-01-01
Human-robot interaction (HRI) is about understanding and shaping the interactions between humans and robots (Goodrich & Schultz, 2007). It is important to evaluate how the design of interfaces and command modalities affect the human s ability to perform tasks accurately, efficiently, and effectively (Crandall, Goodrich, Olsen Jr., & Nielsen, 2005) It is also critical to evaluate the effects of human-robot interfaces and command modalities on operator mental workload (Sheridan, 1992) and situation awareness (Endsley, Bolt , & Jones, 2003). By understanding the effects of interface design on human performance, workload, and situation awareness, interfaces can be developed that support the human in performing tasks with minimal errors and with appropriate interaction time and effort. Thus, the results of research on human-robot interfaces have direct implications for design. Because the factors associated with interfaces and command modalities in HRI are too numerous to address in 3 years of research, the proposed research concentrates on three manageable areas applicable to National Aeronautics and Space Administration (NASA) robot systems. These topic areas emerged from the Fiscal Year (FY) 2011 work that included extensive literature reviews and observations of NASA systems. The three topic areas are: 1) video overlays, 2) camera views, and 3) command modalities. Each area is described in detail below, along with relevance to existing NASA human-robot systems. In addition to studies in these three topic areas, a workshop is proposed for FY12. The workshop will bring together experts in human-robot interaction and robotics to discuss the state of the practice as applicable to research in space robotics. Studies proposed in the area of video overlays consider two factors in the implementation of augmented reality (AR) for operator displays during teleoperation. The first of these factors is the type of navigational guidance provided by AR symbology. In the proposed studies, participants performance during teleoperation of a robot arm will be compared when they are provided with command-guidance symbology (that is, directing the operator what commands to make) or situation-guidance symbology (that is, providing natural cues so that the operator can infer what commands to make). The second factor for AR symbology is the effects of overlays that are either superimposed or integrated into the external view of the world. A study is proposed in which the effects of superimposed and integrated overlays on operator task performance during teleoperated driving tasks are compared
Model-based correction for local stress-induced overlay errors
NASA Astrophysics Data System (ADS)
Stobert, Ian; Krishnamurthy, Subramanian; Shi, Hongbo; Stiffler, Scott
2018-03-01
Manufacturing embedded DRAM deep trench capacitors can involve etching very deep holes into silicon wafers1. Due to various design constraints, these holes may not be uniformly distributed across the wafer surface. Some wafer processing steps for these trenches results in stress effects which can distort the silicon wafer in a manner that creates localized alignment issues between the trenches and the structures built above them on the wafer. In this paper, we describe a method to model these localized silicon distortions for complex layouts involving billions of deep trench structures. We describe wafer metrology techniques and data which have been used to verify the stress distortion model accuracy. We also provide a description of how this kind of model can be used to manipulate the polygons in the mask tape out flow to compensate for predicted localized misalignments between design shapes from a deep trench mask and subsequent masks.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Hossain, M.; Funk, L.P.; Sadeq, M.A.
1995-06-01
The major objective of this project was to formulate a Chunk Rubber Asphalt Concrete (CRAC) mix for use on low volume roads. CRAC is a rubber modified asphalt concrete product produced by the `dry process` where rubber chunks of 1/2 inch size are used as aggregate in a cold mix with a type C fly ash. The second objective of this project was to develop guidelines concerning the use of rubber modified asphalt concrete hot mix to include: (1) Design methods for use of asphalt-rubber mix for new construction and overlay, (2) Mix design method for asphalt-rubber, and (3) Testmore » method for determining the amount of rubber in an asphalt-rubber concrete for quality control purposes.« less
ARIES: Enabling Visual Exploration and Organization of Art Image Collections.
Crissaff, Lhaylla; Wood Ruby, Louisa; Deutch, Samantha; DuBois, R Luke; Fekete, Jean-Daniel; Freire, Juliana; Silva, Claudio
2018-01-01
Art historians have traditionally used physical light boxes to prepare exhibits or curate collections. On a light box, they can place slides or printed images, move the images around at will, group them as desired, and visual-ly compare them. The transition to digital images has rendered this workflow obsolete. Now, art historians lack well-designed, unified interactive software tools that effectively support the operations they perform with physi-cal light boxes. To address this problem, we designed ARIES (ARt Image Exploration Space), an interactive image manipulation system that enables the exploration and organization of fine digital art. The system allows images to be compared in multiple ways, offering dynamic overlays analogous to a physical light box, and sup-porting advanced image comparisons and feature-matching functions, available through computational image processing. We demonstrate the effectiveness of our system to support art historians tasks through real use cases.
DOT National Transportation Integrated Search
1995-07-01
This report documents the construction and performance of two thin polymer concrete (with polyester/styrene resins) bridge deck overlays. The overlays were constructed in Biggs and Maupin, Oregon in June 1993. : Several problems were encountered duri...
Microsilica modified concrete for bridge deck overlays : construction report.
DOT National Transportation Integrated Search
1990-10-01
The study objective was to see if microsilica concrete (MC) is a viable alternative to the latex modified concrete (LMC) usually used on bridge deck overlays in Oregon. The study addresses MC overlays placed in 1989 on Portland cement concrete (PCC) ...
Overcoming Sequence Misalignments with Weighted Structural Superposition
Khazanov, Nickolay A.; Damm-Ganamet, Kelly L.; Quang, Daniel X.; Carlson, Heather A.
2012-01-01
An appropriate structural superposition identifies similarities and differences between homologous proteins that are not evident from sequence alignments alone. We have coupled our Gaussian-weighted RMSD (wRMSD) tool with a sequence aligner and seed extension (SE) algorithm to create a robust technique for overlaying structures and aligning sequences of homologous proteins (HwRMSD). HwRMSD overcomes errors in the initial sequence alignment that would normally propagate into a standard RMSD overlay. SE can generate a corrected sequence alignment from the improved structural superposition obtained by wRMSD. HwRMSD’s robust performance and its superiority over standard RMSD are demonstrated over a range of homologous proteins. Its better overlay results in corrected sequence alignments with good agreement to HOMSTRAD. Finally, HwRMSD is compared to established structural alignment methods: FATCAT, SSM, CE, and Dalilite. Most methods are comparable at placing residue pairs within 2 Å, but HwRMSD places many more residue pairs within 1 Å, providing a clear advantage. Such high accuracy is essential in drug design, where small distances can have a large impact on computational predictions. This level of accuracy is also needed to correct sequence alignments in an automated fashion, especially for omics-scale analysis. HwRMSD can align homologs with low sequence identity and large conformational differences, cases where both sequence-based and structural-based methods may fail. The HwRMSD pipeline overcomes the dependency of structural overlays on initial sequence pairing and removes the need to determine the best sequence-alignment method, substitution matrix, and gap parameters for each unique pair of homologs. PMID:22733542
Real-time self-calibration of a tracked augmented reality display
NASA Astrophysics Data System (ADS)
Baum, Zachary; Lasso, Andras; Ungi, Tamas; Fichtinger, Gabor
2016-03-01
PURPOSE: Augmented reality systems have been proposed for image-guided needle interventions but they have not become widely used in clinical practice due to restrictions such as limited portability, low display refresh rates, and tedious calibration procedures. We propose a handheld tablet-based self-calibrating image overlay system. METHODS: A modular handheld augmented reality viewbox was constructed from a tablet computer and a semi-transparent mirror. A consistent and precise self-calibration method, without the use of any temporary markers, was designed to achieve an accurate calibration of the system. Markers attached to the viewbox and patient are simultaneously tracked using an optical pose tracker to report the position of the patient with respect to a displayed image plane that is visualized in real-time. The software was built using the open-source 3D Slicer application platform's SlicerIGT extension and the PLUS toolkit. RESULTS: The accuracy of the image overlay with image-guided needle interventions yielded a mean absolute position error of 0.99 mm (95th percentile 1.93 mm) in-plane of the overlay and a mean absolute position error of 0.61 mm (95th percentile 1.19 mm) out-of-plane. This accuracy is clinically acceptable for tool guidance during various procedures, such as musculoskeletal injections. CONCLUSION: A self-calibration method was developed and evaluated for a tracked augmented reality display. The results show potential for the use of handheld image overlays in clinical studies with image-guided needle interventions.
Synthesizing 3D Surfaces from Parameterized Strip Charts
NASA Technical Reports Server (NTRS)
Robinson, Peter I.; Gomez, Julian; Morehouse, Michael; Gawdiak, Yuri
2004-01-01
We believe 3D information visualization has the power to unlock new levels of productivity in the monitoring and control of complex processes. Our goal is to provide visual methods to allow for rapid human insight into systems consisting of thousands to millions of parameters. We explore this hypothesis in two complex domains: NASA program management and NASA International Space Station (ISS) spacecraft computer operations. We seek to extend a common form of visualization called the strip chart from 2D to 3D. A strip chart can display the time series progression of a parameter and allows for trends and events to be identified. Strip charts can be overlayed when multiple parameters need to visualized in order to correlate their events. When many parameters are involved, the direct overlaying of strip charts can become confusing and may not fully utilize the graphing area to convey the relationships between the parameters. We provide a solution to this problem by generating 3D surfaces from parameterized strip charts. The 3D surface utilizes significantly more screen area to illustrate the differences in the parameters and the overlayed strip charts, and it can rapidly be scanned by humans to gain insight. The selection of the third dimension must be a parallel or parameterized homogenous resource in the target domain, defined using a finite, ordered, enumerated type, and not a heterogeneous type. We demonstrate our concepts with examples from the NASA program management domain (assessing the state of many plans) and the computers of the ISS (assessing the state of many computers). We identify 2D strip charts in each domain and show how to construct the corresponding 3D surfaces. The user can navigate the surface, zooming in on regions of interest, setting a mark and drilling down to source documents from which the data points have been derived. We close by discussing design issues, related work, and implementation challenges.
Comprehensive analysis of statistical and model-based overlay lot disposition methods
NASA Astrophysics Data System (ADS)
Crow, David A.; Flugaur, Ken; Pellegrini, Joseph C.; Joubert, Etienne L.
2001-08-01
Overlay lot disposition algorithms in lithography occupy some of the highest leverage decision points in the microelectronic manufacturing process. In a typical large volume sub-0.18micrometers fab the lithography lot disposition decision is made about 500 times per day. Each decision will send a lot of wafers either to the next irreversible process step or back to rework in an attempt to improve unacceptable overlay performance. In the case of rework, the intention is that the reworked lot will represent better yield (and thus more value) than the original lot and that the enhanced lot value will exceed the cost of rework. Given that the estimated cost of reworking a critical-level lot is around 10,000 (based upon the opportunity cost of consuming time on a state-of-the-art DUV scanner), we are faced with the implication that the lithography lot disposition decision process impacts up to 5 million per day in decisions. That means that a 1% error rate in this decision process represents over 18 million per year lost in profit for a representative sit. Remarkably, despite this huge leverage, the lithography lot disposition decision algorithm usually receives minimal attention. In many cases, this lack of attention has resulted in the retention of sub-optimal algorithms from earlier process generations and a significant negative impact on the economic output of many high-volume manufacturing sites. An ideal lot- dispositioning algorithm would be an algorithm that results into the best economic decision being made every time - lots would only be reworked where the expected value (EV) of the reworked lot minus the expected value of the original lot exceeds the cost of the rework: EV(reworked lot)- EV(original lot)>COST(rework process) Calculating the above expected values in real-time has generally been deemed too complicated and maintenance-intensive to be practical for fab operations, so a simplified rule is typically used.
DOT National Transportation Integrated Search
2012-02-01
Hot mix asphalt (HMA) overlay is one of the most commonly used methods for rehabilitating deteriorated pavements. One major type of distress influencing the life of an overlay is reflective cracking. Many departments of transportation have implemente...
Latex modified Portland cement overlays : an analysis of samples removed from a bridge deck.
DOT National Transportation Integrated Search
1975-01-01
This report describes an evaluation of the latex modified mortar overlay the Route 85 (NBL) bridge over the Roanoke River. While the performance of the overlay has been generally satisfactory, corings and chloride analyses indicate the possibility of...
Effects of concrete moisture on polymer overlay bond over new concrete.
DOT National Transportation Integrated Search
2015-06-01
Epoxy polymer overlays have been used for decades on existing bridge decks to protect the deck and extend its : service life. The polymer overlays ability to seal a bridge deck is now being specified for new construction. Questions exist : about t...
Microsilica modified concrete for bridge deck overlays : first-year interim report.
DOT National Transportation Integrated Search
1991-11-01
The study objective was to see if microsilica concrete (MC) is a viable alternative to the latex modified concrete (LMC) usually used on bridge deck overlays in Oregon. The study addresses MC overlays placed in 1989 on 7 portland cement concrete (PCC...
Effectiveness of polymer bridge deck overlays in highway noise reduction : technical paper.
DOT National Transportation Integrated Search
2016-04-01
The Kansas Department of Transportation (KDOT) began placing multi-layer polymer bridge deck overlays in 1999 and at the present time have over 200 in service. A few years after placing the overlays, individuals indicated that they noticed how quiet ...
Evaluation of hydraulic cement concrete overlays placed on three pavements in Virginia.
DOT National Transportation Integrated Search
2000-08-01
Three hydraulic cement concrete pavement overlays were placed in the summer of 1995 at three locations in Virginia. Two of the overlays were placed on continuously reinforced concrete pavement to prevent spalling caused by a shy cover over the reinfo...
New LowP bridge overlays performing well in St. Louis area.
DOT National Transportation Integrated Search
2010-01-01
Closing bridge decks for rehabilitation is an inconvenience for Missouri motorists. MoDOT is aggressively pursuing alternate materials to speed up this process to provide a smooth pavement with minimal traffic interruptions. Unfortunately, many mater...
DOT National Transportation Integrated Search
2017-12-01
When Portland cement concrete (PCC) pavement reaches an intolerable level of service, it is commonly overlaid with asphaltic concrete (AC) and is referred to as a composite pavement. Even though AC overlays are designed to resist failure mechanisms s...
Simple Magnetic Device Indicates Thickness Of Alloy 903
NASA Technical Reports Server (NTRS)
Long, Pin Jeng; Rodriguez, Sergio; Bright, Mark L.
1995-01-01
Handheld device called "ferrite indicator" orginally designed for use in determining ferrite content of specimen of steel. Placed in contact with specimen and functions by indicating whether magnet attracted more strongly to specimen or to calibrated reference sample. Relative strength of attraction shows whether alloy overlay thinner than allowable.
Effects of concrete moisture on polymer overlay bond over new concrete : [technical summary].
DOT National Transportation Integrated Search
2015-06-01
Epoxy polymer overlays have been used for decades on existing bridge decks to protect : the deck and extend its service life. The polymer overlays ability to seal a bridge deck : is now being specified for new construction. Questions exist about t...
DOT National Transportation Integrated Search
1988-06-01
This report documents the construction and initial evaluation of several experimental features which were incorporated as part of an overlay of an existing PCC pavement in order to determine the feasibility of extending overlay service life. The expe...
The use of fiber reinforcement in latex modified concrete overlay : final report.
DOT National Transportation Integrated Search
2016-12-01
The requirement to quickly reopen highways in North Carolina has motivated the increased use of rapid-setting concrete in overlays. The addition of polymer latex to the material has been used to increase the service life of the overlays. The latex mo...
Three year evaluation of I-40 crack and seat experimental project
DOT National Transportation Integrated Search
1989-10-01
In 1986, Project I-40-3(31) was rehabilitated using crack and seat techniques and overlaying with a 4-inch HMAC overlay. The crack and seat technique was utilized to prevent reflection cracking in the HMAC overlay caused by joints in the existing JPC...
A field investigation of concrete overlays containing latex, silica fume, or Pyrament cement.
DOT National Transportation Integrated Search
1996-01-01
This study evaluated latex-modified concretes (LMC) and concretes containing silica fume (SFC) or Pyrament-blended cement (PBCC) in bridge deck overlays in the field. The condition of the overlays was monitored for 4 years. LMC and SFC were placed in...
Performance of thin bonded epoxy overlays on asphalt and concrete bridge deck surfaces.
DOT National Transportation Integrated Search
2014-06-01
This study is the evaluation of two thin bonded epoxy overlays: SafeLane (marketed by Cargill), and Flexogrid : (developed by PolyCarb). SafeLane is advertised as an anti-skid/anti-icing overlay that stores deicing chemicals for : release during wint...
Software for MR image overlay guided needle insertions: the clinical translation process
NASA Astrophysics Data System (ADS)
Ungi, Tamas; U-Thainual, Paweena; Fritz, Jan; Iordachita, Iulian I.; Flammang, Aaron J.; Carrino, John A.; Fichtinger, Gabor
2013-03-01
PURPOSE: Needle guidance software using augmented reality image overlay was translated from the experimental phase to support preclinical and clinical studies. Major functional and structural changes were needed to meet clinical requirements. We present the process applied to fulfill these requirements, and selected features that may be applied in the translational phase of other image-guided surgical navigation systems. METHODS: We used an agile software development process for rapid adaptation to unforeseen clinical requests. The process is based on iterations of operating room test sessions, feedback discussions, and software development sprints. The open-source application framework of 3D Slicer and the NA-MIC kit provided sufficient flexibility and stable software foundations for this work. RESULTS: All requirements were addressed in a process with 19 operating room test iterations. Most features developed in this phase were related to workflow simplification and operator feedback. CONCLUSION: Efficient and affordable modifications were facilitated by an open source application framework and frequent clinical feedback sessions. Results of cadaver experiments show that software requirements were successfully solved after a limited number of operating room tests.
Design and analysis of a silicon-based antiresonant reflecting optical waveguide chemical sensor
NASA Astrophysics Data System (ADS)
Remley, Kate A.; Weisshaar, Andreas
1996-08-01
The design of a silicon-based antiresonant reflecting optical waveguide (ARROW) chemical sensor is presented, and its theoretical performance is compared with that of a conventional structure. The use of an ARROW structure permits incorporation of a thick guiding region for efficient coupling to a single-mode fiber. A high-index overlay is added to fine tune the sensitivity of the ARROW chemical sensor. The sensitivity of the sensor is presented, and design trade-offs are discussed.
The GRIDView Visualization Package
NASA Astrophysics Data System (ADS)
Kent, B. R.
2011-07-01
Large three-dimensional data cubes, catalogs, and spectral line archives are increasingly important elements of the data discovery process in astronomy. Visualization of large data volumes is of vital importance for the success of large spectral line surveys. Examples of data reduction utilizing the GRIDView software package are shown. The package allows users to manipulate data cubes, extract spectral profiles, and measure line properties. The package and included graphical user interfaces (GUIs) are designed with pipeline infrastructure in mind. The software has been used with great success analyzing spectral line and continuum data sets obtained from large radio survey collaborations. The tools are also important for multi-wavelength cross-correlation studies and incorporate Virtual Observatory client applications for overlaying database information in real time as cubes are examined by users.
NASA Astrophysics Data System (ADS)
Cowan, James J.
1984-05-01
A unique type of holographic imagery and its large scale replication are described. The "Newport Button", which was designed as an advertising premium item for the Newport Corporation, incorporates a complex overlay of holographic diffraction gratings surrounding a three-dimensional holographic image of a real object. The combined pattern is recorded onto a photosensitive medium from which a metal master is made. The master is subsequently used to repeatedly emboss the pattern into a thin plastic sheet. Individual patterns are then die cut from the metallized plastic and mounted onto buttons. A discussion is given of the diffraction efficiencies of holograms made in this particular fashion and of the special requirements of the replication process.
Fitting Square Pegs into round Holes: Doing Qualitative Nursing Research in a Quantitative World.
Newton, Lorelei; Kimpson, Sally
2014-09-01
The authors, as doctoral candidates and registered nurses, took on a qualitative research project investigating nursing practice in a research-intensive organization. Their aims were to explore and describe how nurses in the ambulatory care setting assist patients and families, including how nursing practice was carried out, constraints to practice, and the influence of the interprofessional milieu. Their first finding, in part because of the qualitative research design used, concerned the potential impact of the organizational ethics review process on the project. The authors discuss how the language, definition of risk, and notion of informed consent articulated in the organizational review process influenced both the research timeline and (potentially) the study itself. While not dismissing the value of ethics review, they explore the tension of overlaying generic criteria for quantitative research, specifically randomized controlled trials, on nursing research from other traditions. Copyright© by Ingram School of Nursing, McGill University.
Design and implementation of spatial knowledge grid for integrated spatial analysis
NASA Astrophysics Data System (ADS)
Liu, Xiangnan; Guan, Li; Wang, Ping
2006-10-01
Supported by spatial information grid(SIG), the spatial knowledge grid (SKG) for integrated spatial analysis utilizes the middleware technology in constructing the spatial information grid computation environment and spatial information service system, develops spatial entity oriented spatial data organization technology, carries out the profound computation of the spatial structure and spatial process pattern on the basis of Grid GIS infrastructure, spatial data grid and spatial information grid (specialized definition). At the same time, it realizes the complex spatial pattern expression and the spatial function process simulation by taking the spatial intelligent agent as the core to establish space initiative computation. Moreover through the establishment of virtual geographical environment with man-machine interactivity and blending, complex spatial modeling, network cooperation work and spatial community decision knowledge driven are achieved. The framework of SKG is discussed systematically in this paper. Its implement flow and the key technology with examples of overlay analysis are proposed as well.
DOT National Transportation Integrated Search
2009-05-01
This project evaluated the ability of interlayer systems used in HMA overlays to retard reflective cracking. Field : crack surveys and forensic investigation, including video imaging and ground penetrating radar surveys as well : as laboratory testin...
DOT National Transportation Integrated Search
2009-05-01
In an effort to control reflective cracking in hot-mix asphalt (HMA) overlays placed over Portland Cement : Concrete (PCC) pavements, several reflective crack control (RCC) systems, including interlayer systems, : have been used. However, the cost-ef...
DOT National Transportation Integrated Search
1999-04-01
Hydraulic cement concrete pavement overlays were placed in the summer of 1995 at the following locations in Virginia: : 1-295 near Richmond : 1-85 near Petersburg : Rt. 29 near Charlottesville. : Overlays were placed on 1-295 SBL (near mi...
DOT National Transportation Integrated Search
1983-01-01
The installation of thin polymer concrete overlays on five bridges on I-85 near Williamsburg, Virginia, has demonstrated that an overlay of low permeability and high skid resistance can be successfully installed by a contractor with a minimum of disr...
Driving imaging and overlay performance to the limits with advanced lithography optimization
NASA Astrophysics Data System (ADS)
Mulkens, Jan; Finders, Jo; van der Laan, Hans; Hinnen, Paul; Kubis, Michael; Beems, Marcel
2012-03-01
Immersion lithography is being extended to 22-nm and even below. Next to generic scanner system improvements, application specific solutions are needed to follow the requirements for CD control and overlay. Starting from the performance budgets, this paper discusses how to improve (in volume manufacturing environment) CDU towards 1-nm and overlay towards 3-nm. The improvements are based on deploying the actuator capabilities of the immersion scanner. The latest generation immersion scanners have extended the correction capabilities for overlay and imaging, offering freeform adjustments of lens, illuminator and wafer grid. In order to determine the needed adjustments the recipe generation per user application is based on a combination wafer metrology data and computational lithography methods. For overlay, focus and CD metrology we use an angle resolved optical scatterometer.
NASA Astrophysics Data System (ADS)
Park, Dong-Kiu; Kim, Hyun-Sok; Seo, Moo-Young; Ju, Jae-Wuk; Kim, Young-Sik; Shahrjerdy, Mir; van Leest, Arno; Soco, Aileen; Miceli, Giacomo; Massier, Jennifer; McNamara, Elliott; Hinnen, Paul; Böcker, Paul; Oh, Nang-Lyeom; Jung, Sang-Hoon; Chai, Yvon; Lee, Jun-Hyung
2018-03-01
This paper demonstrates the improvement using the YieldStar S-1250D small spot, high-NA, after-etch overlay in-device measurements in a DRAM HVM environment. It will be demonstrated that In-device metrology (IDM) captures after-etch device fingerprints more accurately compared to the industry-standard CDSEM. Also, IDM measurements (acquiring both CD and overlay) can be executed significantly faster increasing the wafer sampling density that is possible within a realistic metrology budget. The improvements to both speed and accuracy open the possibility of extended modeling and correction capabilities for control. The proof-book data of this paper shows a 36% improvement of device overlay after switching to control in a DRAM HVM environment using indevice metrology.
Improved control of multi-layer overlay in advanced 8nm logic nodes
NASA Astrophysics Data System (ADS)
Kim, Tae-Sun; Park, Young-Sik; Kim, Yong-Chul; Kim, Byoung-Hoon; Lee, Ji-Hun; Kwak, Min-Keun; Choi, Sung-Won; Park, Joon-Soo; Yang, Hong-Cheon; Meixner, Philipp; Lee, Dong-jin; Kwon, Oh-Sung; Kim, Hyun-Su; Park, Jin-Tae; Lee, Sung-Min; Grouwstra, Cedric; van der Meijden, Vidar; El Kodadi, Mohamed; Kim, Chris; Guittet, Pierre-Yves; Nooitgedagt, Tjitte
2018-03-01
With the increase of litho-etch steps the industry requires metrology to deliver solutions to improve throughput of overlay measurements without impacting accuracy. ASML's YieldStar 350E is capable of utilizing targets, which can measure the overlay of multiple layers simultaneously. For the work discussed in this paper, an evaluation is performed on Logic product wafers using both single-layer and multi-layer (MLT) quad type targets (able to capture up to four litho-etch steps). Different target types were compared in terms of Move-and-Acquire (MA) time, residual and matching to SEM. Using the MLT targets, an MA time improvement of 56% was demonstrated on the singlelayer. The maximum delta between the overlay residual among the YieldStar targets after applying an high order model was shown to be 0.05 nm. In comparison to after-etch overlay, the correlation of the MLT target was determined with an R2 > 0.95 using a set-get wafer with induced 10 nm overlay range. On a normal production wafer, the correlation was R2 > 0.67, which is high on a wafer without induced overlay. The comparison of modeling parameters between SEM and MLT targets shows a good match (< 0.16nm) as well.
NASA Astrophysics Data System (ADS)
Paolino, Donald D.; Neel, Michael M.; Franck, Charmaine C.
2002-08-01
Spiral antennas are one of the common radiators used in ground penetrating radar (GPR). Mine detection is generally performed in a frequency band of interest between 500 MHz to 4 GHz. This paper discusses technical recommendations and R&D performed by Naval Air Warfare Center (NAWC), China Lake, CA , resulting in our best effort spiral design emphasizing highest low band gain while maintaining overall axial ratio purity. This design consisted of a spiral printed on a high dielectric substrate that allowed the antenna to be used at lower frequencies then conventional plastic substrate based two arm spirals of the same diameter. A graded dielectric overlay scheme was employed to facilitate matching to free space on one side, and absorber lined cavity on the other. Test data is given in terms of match and free space patterns using spin linear sources to obtain antenna axial ratios. The low-end gain was improved from -17 dBi to -5 dBi. Two Vivaldi slot antennas (star junction fed and an antipodal construction) are discussed as alternative antennas offering broadband high gain and economical construction. Both designs produced good patterns with a +5 dBi average gain over the band. Patterns for the log spiral and Archimedean spiral, together with recommendations for future improvements are provided.
Ranking protective coatings: Laboratory vs. field experience
NASA Astrophysics Data System (ADS)
Conner, Jeffrey A.; Connor, William B.
1994-12-01
Environmentally protective coatings are used on a wide range of gas turbine components for survival in the harsh operating conditions of engines. A host of coatings are commercially available to protect hot-section components, ranging from simple aluminides to designer metallic overlays and ceramic thermal barrier coatings. A variety of coating-application processes are available, and they range from simple pack cementation processing to complex physical vapor deposition, which requires multimillion dollar facilities. Detailed databases are available for most coatings and coating/process combinations for a range of laboratory tests. Still, the analysis of components actually used in engines often yields surprises when compared against predicted coating behavior from laboratory testing. This paper highlights recent work to develop new laboratory tests that better simulate engine environments. Comparison of in-flight coating performance as well as industrial and factory engine testing on a range of hardware is presented along with laboratory predictions from standard testing and from recently developed cyclic burner-rig testing.
DOE Office of Scientific and Technical Information (OSTI.GOV)
May, Robert A.; Smith, R. Scott; Kay, Bruce D.
2012-02-02
Temperature programmed desorption (TPD) is utilized to determine the length distribution of cracks formed through amorphous solid water (ASW) during crystallization. This distribution is determined by monitoring how the thickness of an ASW overlayer alters desorption of an underlayer of O2. As deposited the ASW overlayer prevents desorption of O2. During crystallization, cracks form through the ASW overlayer and open a path to vacuum which allows O2 to escape in a rapid episodic release known as the 'molecular volcano'. Sufficiently thick ASW overlayers further trap O2 resulting in a second O2 desorption peak commensurate with desorption of the last ofmore » the ASW overlayer. The evolution of this trapping peak with overlayer thickness is the basis for determining the distribution of crystallization induced cracks through the ASW. Reflection adsorption infrared spectroscopy (RAIRS) and TPD of multicomponent parfait structures of ASW, O2 and Kr indicate that a preponderance of these cracks propagate down from the outer surface of the ASW.« less
Evaluation of Some Finishing Properties of Oil Palm Particleboard for Furniture Application
NASA Astrophysics Data System (ADS)
Ratnasingam, J.; Nyugen, V.; Ioras, F.
The finishing properties of particleboard made from the Empty-Fruit Bunch (EFB) of oil palm (Elaeis guineensis Jacq.) were evaluated for its suitability for furniture applications, using different coating and overlay materials. The results found that the thick plastic-formica overlay provided the best surface finish, in terms of surface smoothness, adhesion strength and impact resistance. Although the polyurethane lacquer provided an acceptable finish, its quality and performance is not comparable to that of the thick plastic overlay. Despite the fact that the use of such overlay material may render the material not aesthetically appealing and limit it to concealed applications or where the thick overlay material is tolerated, its cost competitiveness and environmental friendliness may be able to position the oil palm particleboard as a substitute for the conventional wood-based particleboard in the furniture manufacturing industry.
NASA Technical Reports Server (NTRS)
Middleton, W. D.; Lundry, J. L.
1976-01-01
An integrated system of computer programs was developed for the design and analysis of supersonic configurations. The system uses linearized theory methods for the calculation of surface pressures and supersonic area rule concepts in combination with linearized theory for calculation of aerodynamic force coefficients. Interactive graphics are optional at the user's request. Schematics of the program structure and the individual overlays and subroutines are described.
Rastogi, Jyoti; Jain, Chandni; Singh, Harkanwal Preet
2012-01-01
Overlay complete dentures are simple, reversible and economical treatment modality for patients with congenital or acquired disorders that severely affect the tooth development. It satisfies both the esthetic and functional demands where the extraction of teeth is not generally indicated. In pediatric patients, the overlay dentures establish a relatively stable occlusion that improves patient's tolerance to the future treatment procedures for worn dentition. This clinical report highlights the imperative need of appropriate treatment strategy and application of maxillary and mandibular overlay dentures in a pediatric patient who suffered from congenitally mutilated and worn dentition. PMID:23236577
Morimoto, S; Rebello de Sampaio, F B W; Braga, M M; Sesma, N; Özcan, M
2016-08-01
This systematic review and meta-analysis aimed to evaluate the survival rate of ceramic and resin inlays, onlays, and overlays and to identify the complication types associated with the main clinical outcomes. Two reviewers searched PubMed, EMBASE, and the Cochrane Central Register of Controlled Trials for articles published between 1983 through April 2015, conforming to Preferred Reporting Items for Systematic Reviews and Meta-Analyses guidelines for systematic reviews. Clinical studies meeting the following criteria were included: 1) studies related to resin and ceramic inlays, onlays, and overlays; 2) prospective, retrospective, or randomized controlled trials conducted in humans; 3) studies with a dropout rate of less than 30%; and 4) studies with a follow-up longer than 5 y. Of 1,389 articles, 14 met the inclusion criteria. The meta-regression indicated that the type of ceramic material (feldspathic porcelain vs. glass-ceramic), study design (retrospective vs. prospective), follow-up time (5 vs. 10 y), and study setting (university vs. private clinic) did not affect the survival rate. Estimated survival rates for glass-ceramics and feldspathic porcelain were between 92% and 95% at 5 y (n = 5,811 restorations) and were 91% at 10 y (n = 2,154 restorations). Failures were related to fractures/chipping (4%), followed by endodontic complications (3%), secondary caries (1%), debonding (1%), and severe marginal staining (0%). Odds ratios (95% confidence intervals) were 0.19 (0.04 to 0.96) and 0.54 (0.17 to 1.69) for pulp vitality and type of tooth involved (premolars vs. molars), respectively. Ceramic inlays, onlays, and overlays showed high survival rates at 5 y and 10 y, and fractures were the most frequent cause of failure. © International & American Associations for Dental Research 2016.
Considerations for Software Defined Networking (SDN): Approaches and use cases
NASA Astrophysics Data System (ADS)
Bakshi, K.
Software Defined Networking (SDN) is an evolutionary approach to network design and functionality based on the ability to programmatically modify the behavior of network devices. SDN uses user-customizable and configurable software that's independent of hardware to enable networked systems to expand data flow control. SDN is in large part about understanding and managing a network as a unified abstraction. It will make networks more flexible, dynamic, and cost-efficient, while greatly simplifying operational complexity. And this advanced solution provides several benefits including network and service customizability, configurability, improved operations, and increased performance. There are several approaches to SDN and its practical implementation. Among them, two have risen to prominence with differences in pedigree and implementation. This paper's main focus will be to define, review, and evaluate salient approaches and use cases of the OpenFlow and Virtual Network Overlay approaches to SDN. OpenFlow is a communication protocol that gives access to the forwarding plane of a network's switches and routers. The Virtual Network Overlay relies on a completely virtualized network infrastructure and services to abstract the underlying physical network, which allows the overlay to be mobile to other physical networks. This is an important requirement for cloud computing, where applications and associated network services are migrated to cloud service providers and remote data centers on the fly as resource demands dictate. The paper will discuss how and where SDN can be applied and implemented, including research and academia, virtual multitenant data center, and cloud computing applications. Specific attention will be given to the cloud computing use case, where automated provisioning and programmable overlay for scalable multi-tenancy is leveraged via the SDN approach.
Federal Register 2010, 2011, 2012, 2013, 2014
2013-01-07
...] Petition for Positive Train Control Safety Plan Approval and System Certification of the Electronic Train... the Federal Railroad Administration (FRA) for Positive Train Control (PTC) Safety Plan (PTCSP...-based train control system safety overlay designed to protect against the consequences of train-to-train...
Geography via the Overhead Projector: Do It This Way, 7.
ERIC Educational Resources Information Center
Best, Thomas D.
This booklet is designed to assist teachers in their use of overhead projectors when teaching geography. With the overhead technique, relationships among patterns can be suggested bit by bit on inexpensive, easily prepared overlays that are projected to sizes appropriate for a particular instructional situation. A general discussion of the…
Enhanced treatment selection for reflective joint cracking in composite pavements : final report.
DOT National Transportation Integrated Search
2015-09-01
This research developed a decisionmaking process that can be used by INDOT to enhance identification of the condition of the : underlying concrete joints or cracks by looking at the surface distresses of the asphalt overlay in composite pavements....
NASA Astrophysics Data System (ADS)
Lee, Junyung; Yi, Kyongsu; Yoo, Hyunjae; Chong, Hyokjin; Ko, Bongchul
2015-06-01
This paper describes a risk management algorithm for rear-side collision avoidance. The proposed risk management algorithm consists of a supervisor and a coordinator. The supervisor is designed to monitor collision risks between the subject vehicle and approaching vehicle in the adjacent lane. An appropriate criterion of intervention, which satisfies high acceptance to drivers through the consideration of a realistic traffic, has been determined based on the analysis of the kinematics of the vehicles in longitudinal and lateral directions. In order to assist the driver actively and increase driver's safety, a coordinator is designed to combine lateral control using a steering torque overlay by motor-driven power steering and differential braking by vehicle stability control. In order to prevent the collision while limiting actuator's control inputs and vehicle dynamics to safe values for the assurance of the driver's comfort, the Lyapunov theory and linear matrix inequalities based optimisation methods have been used. The proposed risk management algorithm has been evaluated via simulation using CarSim and MATLAB/Simulink.
Jayaprakash, Paul T
2015-01-01
Establishing identification during skull-photo superimposition relies on correlating the salient morphological features of an unidentified skull with those of a face-image of a suspected dead individual using image overlay processes. Technical progression in the process of overlay has included the incorporation of video cameras, image-mixing devices and software that enables real-time vision-mixing. Conceptual transitions occur in the superimposition methods that involve 'life-size' images, that achieve orientation of the skull to the posture of the face in the photograph and that assess the extent of match. A recent report on the reliability of identification using the superimposition method adopted the currently prevalent methods and suggested an increased rate of failures when skulls were compared with related and unrelated face images. The reported reduction in the reliability of the superimposition method prompted a review of the transition in the concepts that are involved in skull-photo superimposition. The prevalent popular methods for visualizing the superimposed images at less than 'life-size', overlaying skull-face images by relying on the cranial and facial landmarks in the frontal plane when orienting the skull for matching and evaluating the match on a morphological basis by relying on mix-mode alone are the major departures in the methodology that may have reduced the identification reliability. The need to reassess the reliability of the method that incorporates the concepts which have been considered appropriate by the practitioners is stressed. Copyright © 2014 Elsevier Ireland Ltd. All rights reserved.
NASA Astrophysics Data System (ADS)
van Es, Maarten H.; Mohtashami, Abbas; Piras, Daniele; Sadeghian, Hamed
2018-03-01
Nondestructive subsurface nanoimaging through optically opaque media is considered to be extremely challenging and is essential for several semiconductor metrology applications including overlay and alignment and buried void and defect characterization. The current key challenge in overlay and alignment is the measurement of targets that are covered by optically opaque layers. Moreover, with the device dimensions moving to the smaller nodes and the issue of the so-called loading effect causing offsets between between targets and product features, it is increasingly desirable to perform alignment and overlay on product features or so-called on-cell overlay, which requires higher lateral resolution than optical methods can provide. Our recently developed technique known as SubSurface Ultrasonic Resonance Force Microscopy (SSURFM) has shown the capability for high-resolution imaging of structures below a surface based on (visco-)elasticity of the constituent materials and as such is a promising technique to perform overlay and alignment with high resolution in upcoming production nodes. In this paper, we describe the developed SSURFM technique and the experimental results on imaging buried features through various layers and the ability to detect objects with resolution below 10 nm. In summary, the experimental results show that the SSURFM is a potential solution for on-cell overlay and alignment as well as detecting buried defects or voids and generally metrology through optically opaque layers.
Gweon, Hye Mi; Youk, Ji Hyun; Son, Eun Ju; Kim, Jeong-Ah
2013-03-01
To determine whether colour overlay features can be quantified by the standard deviation (SD) of the elasticity measured in shear-wave elastography (SWE) and to evaluate the diagnostic performance for breast masses. One hundred thirty-three breast lesions in 119 consecutive women who underwent SWE before US-guided core needle biopsy or surgical excision were analysed. SWE colour overlay features were assessed using two different colour overlay pattern classifications. Quantitative SD of the elasticity value was measured with the region of interest including the whole breast lesion. For the four-colour overlay pattern, the area under the ROC curve (Az) was 0.947; with a cutoff point between pattern 2 and 3, sensitivity and specificity were 94.4 % and 81.4 %. According to the homogeneity of the elasticity, the Az was 0.887; with a cutoff point between reasonably homogeneous and heterogeneous, sensitivity and specificity were 86.1 % and 82.5 %. For the SD of the elasticity, the Az was 0.944; with a cutoff point of 12.1, sensitivity and specificity were 88.9 % and 89.7 %. The colour overlay features showed significant correlations with the quantitative SD of the elasticity (P < 0.001). The colour overlay features and the SD of the elasticity in SWE showed excellent diagnostic performance and showed good correlations between them.
Key Management Schemes for Peer-to-Peer Multimedia Streaming Overlay Networks
NASA Astrophysics Data System (ADS)
Naranjo, J. A. M.; López-Ramos, J. A.; Casado, L. G.
Key distribution for multimedia live streaming peer-to-peer overlay networks is a field still in its childhood stage. A scheme designed for networks of this kind must seek security and efficiency while keeping in mind the following restrictions: limited bandwidth, continuous playing, great audience size and clients churn. This paper introduces two novel schemes that allow a trade-off between security and efficiency by allowing to dynamically vary the number of levels used in the key hierarchy. These changes are motivated by great variations in audience size, and initiated by decision of the Key Server. Additionally, a comparative study of both is presented, focusing on security and audience size. Results show that larger key hierarchies can supply bigger audiences, but offer less security against statistical attacks. The opposite happens for shorter key hierarchies.
Improving management performance of P2PSIP for mobile sensing in wireless overlays.
Sendín-Raña, Pablo; González-Castaño, Francisco Javier; Gómez-Cuba, Felipe; Asorey-Cacheda, Rafael; Pousada-Carballo, José María
2013-11-08
Future wireless communications are heading towards an all-Internet Protocol (all-IP) design, and will rely on the Session Initiation Protocol (SIP) to manage services, such as voice over IP (VoIP). The centralized architecture of traditional SIP has numerous disadvantages for mobile ad hoc services that may be possibly overcome by advanced peer-to-peer (P2P) technologies initially developed for the Internet. In the context of mobile sensing, P2PSIP protocols facilitate decentralized and fast communications with sensor-enabled terminals. Nevertheless, in order to make P2PSIP protocols feasible in mobile sensing networks, it is necessary to minimize overhead transmissions for signaling purposes, which reduces the battery lifetime. In this paper, we present a solution to improve the management of wireless overlay networks by defining an adaptive algorithm for the calculation of refresh time. The main advantage of the proposed algorithm is that it takes into account new parameters, such as the delay between nodes, and provides satisfactory performance and reliability levels at a much lower management overhead than previous approaches. The proposed solution can be applied to many structured P2P overlays or P2PSIP protocols. We evaluate it with Kademlia-based distributed hash tables (DHT) and dSIP.
Improving Management Performance of P2PSIP for Mobile Sensing in Wireless Overlays
Sendín-Raña, Pablo; González-Castaño, Francisco Javier; Gómez-Cuba, Felipe; Asorey-Cacheda, Rafael; Pousada-Carballo, José María
2013-01-01
Future wireless communications are heading towards an all-Internet Protocol (all-IP) design, and will rely on the Session Initiation Protocol (SIP) to manage services, such as voice over IP (VoIP). The centralized architecture of traditional SIP has numerous disadvantages for mobile ad hoc services that may be possibly overcome by advanced peer-to-peer (P2P) technologies initially developed for the Internet. In the context of mobile sensing, P2PSIP protocols facilitate decentralized and fast communications with sensor-enabled terminals. Nevertheless, in order to make P2PSIP protocols feasible in mobile sensing networks, it is necessary to minimize overhead transmissions for signaling purposes, which reduces the battery lifetime. In this paper, we present a solution to improve the management of wireless overlay networks by defining an adaptive algorithm for the calculation of refresh time. The main advantage of the proposed algorithm is that it takes into account new parameters, such as the delay between nodes, and provides satisfactory performance and reliability levels at a much lower management overhead than previous approaches. The proposed solution can be applied to many structured P2P overlays or P2PSIP protocols. We evaluate it with Kademlia-based distributed hash tables (DHT) and dSIP PMID:24217358
Registration performance on EUV masks using high-resolution registration metrology
NASA Astrophysics Data System (ADS)
Steinert, Steffen; Solowan, Hans-Michael; Park, Jinback; Han, Hakseung; Beyer, Dirk; Scherübl, Thomas
2016-10-01
Next-generation lithography based on EUV continues to move forward to high-volume manufacturing. Given the technical challenges and the throughput concerns a hybrid approach with 193 nm immersion lithography is expected, at least in the initial state. Due to the increasing complexity at smaller nodes a multitude of different masks, both DUV (193 nm) and EUV (13.5 nm) reticles, will then be required in the lithography process-flow. The individual registration of each mask and the resulting overlay error are of crucial importance in order to ensure proper functionality of the chips. While registration and overlay metrology on DUV masks has been the standard for decades, this has yet to be demonstrated on EUV masks. Past generations of mask registration tools were not necessarily limited in their tool stability, but in their resolution capabilities. The scope of this work is an image placement investigation of high-end EUV masks together with a registration and resolution performance qualification. For this we employ a new generation registration metrology system embedded in a production environment for full-spec EUV masks. This paper presents excellent registration performance not only on standard overlay markers but also on more sophisticated e-beam calibration patterns.
ERIC Educational Resources Information Center
Henderson, Lisa M.; Tsogka, Natassa; Snowling, Margaret J.
2013-01-01
Visual stress (the experience of visual distortions and discomfort during prolonged reading) is frequently identified and alleviated with coloured overlays or lenses. Previous studies have associated visual stress with dyslexia and as a consequence, coloured overlays are widely distributed to children and adults with reading difficulty. However,…
49 CFR 236.1015 - PTC Safety Plan content requirements and PTC System Certification.
Code of Federal Regulations, 2013 CFR
2013-10-01
... Administrator finds that the PTCSP and supporting documentation support a finding that the system complies with... additional requirements apply to: (1) Non-vital overlay. A PTC system proposed as an overlay on the existing... greater than the level of safety for the previous PTC systems. (2) Vital overlay. A PTC system proposed on...
49 CFR 236.1015 - PTC Safety Plan content requirements and PTC System Certification.
Code of Federal Regulations, 2012 CFR
2012-10-01
... Administrator finds that the PTCSP and supporting documentation support a finding that the system complies with... additional requirements apply to: (1) Non-vital overlay. A PTC system proposed as an overlay on the existing... greater than the level of safety for the previous PTC systems. (2) Vital overlay. A PTC system proposed on...
49 CFR 236.1015 - PTC Safety Plan content requirements and PTC System Certification.
Code of Federal Regulations, 2011 CFR
2011-10-01
... Administrator finds that the PTCSP and supporting documentation support a finding that the system complies with... additional requirements apply to: (1) Non-vital overlay. A PTC system proposed as an overlay on the existing... greater than the level of safety for the previous PTC systems. (2) Vital overlay. A PTC system proposed on...
DOE Office of Scientific and Technical Information (OSTI.GOV)
Mickalonis, J.; Torres, R.
2012-08-15
Wear and corrosion testing were conducted to evaluate alternate materials of construction for the Saltstone mixer auger and paddles. These components have been degraded by wear from the slurry processed in the mixer. Material test options included PVD coatings (TiN, TiCN, and ZrN), weld overlays (Stellite 12 and Ultimet) and higher hardness steels and carbides (D2 and tungsten carbide). The corrosion testing demonstrated that the slurry is not detrimental to the current materials of construction or the new candidates. The ASTM G75 Miller wear test showed that the high hardness materials and the Stellite 12 weld overlay provide superior wearmore » relative to the Astralloy and CF8M stainless steel, which are the current materials of construction, as well as the PVD coatings and Ultimet. The following recommendations are made for selecting new material options and improving the overall wear resistance of the Saltstone mixer components: A Stellite 12 weld overlay or higher hardness steel (with toughness equivalent to Astralloy) be used to improve the wear resistance of the Saltstone mixer paddles; other manufacturing specifications for the mixer need to be considered in this selection. The current use of the Stellite 12 weld overlay be evaluated so that coverage of the 316 auger can be optimized for improved wear resistance of the auger. The wear surfaces of the Saltstone mixer auger and paddles be evaluated so that laboratory data can be better correlated to actual service. The 2-inch Saltstone mixer prototype be used to verify material performance.« less
Evaluation of Tizian overlays by means of a swept source optical coherence tomography system
NASA Astrophysics Data System (ADS)
Marcauteanu, Corina; Sinescu, Cosmin; Negrutiu, Meda Lavinia; Stoica, Eniko Tunde; Topala, Florin; Duma, Virgil Florin; Bradu, Adrian; Podoleanu, Adrian Gh.
2016-03-01
The teeth affected by pathologic attrition can be restored by a minimally invasive approach, using Tizian overlays. In this study we prove the advantages of a fast swept source (SS) OCT system in the evaluation of Tizian overlays placed in an environment characterized by high occlusal forces. 12 maxillary first premolars were extracted and prepared for overlays. The Tizian overlays were subjected to 3000 alternating cycles of thermo-cycling (from -10°C to +50°C) and to mechanical occlusal overloads (at 800 N). A fast SS OCT system was used to evaluate the Tizian overlays before and after the mechanical and thermal straining. The SS (Axsun Technologies, Billerica, MA) has a central wavelength of 1060 nm, sweeping range of 106 nm (quoted at 10 dB) and a 100 kHz line rate. The depth resolution of the system, measured experimentally in air was 10 μm. The imaging system used for this study offers high spatial resolutions in both directions, transversal and longitudinal of around 10 μm, a high sensitivity, and it is also able to acquire entire tridimensional (3D)/volume reconstructions as fast as 2.5 s. Once the full dataset was acquired, rendered high resolutions en-face projections could be produced. Using them, the overlay (i.e., cement) abutment tooth interfaces were remarked both on B-scans/two-dimensional (2D) sections and in the 3D reconstructions. Using the system several open interfaces were possible to detect. The fast SS OCT system thus proves useful in the evaluation of zirconia reinforced composite overlays, placed in an environment characterized by high occlusal forces.
Latest performance of ArF immersion scanner NSR-S630D for high-volume manufacturing for 7nm node
NASA Astrophysics Data System (ADS)
Funatsu, Takayuki; Uehara, Yusaku; Hikida, Yujiro; Hayakawa, Akira; Ishiyama, Satoshi; Hirayama, Toru; Kono, Hirotaka; Shirata, Yosuke; Shibazaki, Yuichi
2015-03-01
In order to achieve stable operation in cutting-edge semiconductor manufacturing, Nikon has developed NSR-S630D with extremely accurate overlay while maintaining throughput in various conditions resembling a real production environment. In addition, NSR-S630D has been equipped with enhanced capabilities to maintain long-term overlay stability and user interface improvement all due to our newly developed application software platform. In this paper, we describe the most recent S630D performance in various conditions similar to real productions. In a production environment, superior overlay accuracy with high dose conditions and high throughput are often required; therefore, we have performed several experiments with high dose conditions to demonstrate NSR's thermal aberration capabilities in order to achieve world class overlay performance. Furthermore, we will introduce our new software that enables long term overlay performance.
Effects of Spectral Overlays on Reading Performance of Brazilian Elementary School Children.
Garcia, Ana Carla Oliveira; Momensohn-Santos, Teresa Maria; Vilhena, Douglas de Araújo
2018-03-20
To investigate the effects of spectral overlays on reading performance of Brazilian elementary school children. Sixty-eight children (aged 9-12 years) enrolled in the 5th and 6th grade were included in the study. The Rate of Reading Test (RRT - Brazilian Portuguese version) was used to evaluate reading speed and the Irlen Reading Perceptual Scale was used to allocate the sample according to reading difficulty/discomfort symptoms and to define the optimal spectral overlays. A total of 13% of the children presented an improvement of at least 15% in reading speed with the use of spectral overlays. Pupils with severe reading difficulties tended to have more improvement in RRT with spectral overlays. Children with severe reading discomfort obtained the highest gains in RRT, with an average of 9.6% improvement with intervention, compared to a decrease of -8.2% in the control group. Participants with severe discomfort had an odds ratio of 3.36 to improve reading speed with intervention compared to the control group. The use of spectral overlays can improve reading performance, particularly in those children with severe visual discomfort. © 2018 S. Karger AG, Basel.
Electronic structure of uranium overlayers on magnesium and aluminium
NASA Astrophysics Data System (ADS)
Gouder, T.
1997-06-01
We studied U overlayers on polycrystalline Mg and Al by X-ray and ultra-violet photoelectron spectroscopies (XPS and UPS, respectively), and compared the mode of growth and the evolution of the electronic structure as a function of coverage. The goal of this work was to detect localization, or at least correlation effects, in U overlayers and U substrate near surface alloys, which were expected to occur because of the reduced U 5f bandwidth in these systems. On Mg, U deposits as a pure overlayer without any interdiffusion, while on Al spontaneous interdiffusion takes place. The U 4f spectra of {U}/{Mg} show only weak correlation satellites. Nevertheless, the asymmetrical shape of the U 4f peak indicates 5f band narrowing. On Al, strong correlation satellites are observed in addition to plasmon loss features. It seems that U-substrate interactions promote correlation effects, while the reduced coordination in overlayers plays a less important role. UPS valence-band (VB) spectra of the two systems look remarkably similar. They do not show any correlation satellites. With decreasing overlayer thickness the 5f peak narrows, which is attributed to 5f band narrowing at the surface.
A processing centre for the CNES CE-GPS experimentation
NASA Technical Reports Server (NTRS)
Suard, Norbert; Durand, Jean-Claude
1994-01-01
CNES is involved in a GPS (Global Positioning System) geostationary overlay experimentation. The purpose of this experimentation is to test various new techniques in order to select the optimal station synchronization method, as well as the geostationary spacecraft orbitography method. These new techniques are needed to develop the Ranging GPS Integrity Channel services. The CNES experimentation includes three transmitting/receiving ground stations (manufactured by IN-SNEC), one INMARSAT 2 C/L band transponder and a processing center named STE (Station de Traitements de l'Experimentation). Not all the techniques to be tested are implemented, but the experimental system has to include several functions; part of the future system simulation functions, such as a servo-loop function, and in particular a data collection function providing for rapid monitoring of system operation, analysis of existing ground station processes, and several weeks of data coverage for other scientific studies. This paper discusses system architecture and some criteria used in its design, as well as the monitoring function, the approach used to develop a low-cost and short-life processing center in collaboration with a CNES sub-contractor (ATTDATAID), and some results.
VMCast: A VM-Assisted Stability Enhancing Solution for Tree-Based Overlay Multicast
Gu, Weidong; Zhang, Xinchang; Gong, Bin; Zhang, Wei; Wang, Lu
2015-01-01
Tree-based overlay multicast is an effective group communication method for media streaming applications. However, a group member’s departure causes all of its descendants to be disconnected from the multicast tree for some time, which results in poor performance. The above problem is difficult to be addressed because overlay multicast tree is intrinsically instable. In this paper, we proposed a novel stability enhancing solution, VMCast, for tree-based overlay multicast. This solution uses two types of on-demand cloud virtual machines (VMs), i.e., multicast VMs (MVMs) and compensation VMs (CVMs). MVMs are used to disseminate the multicast data, whereas CVMs are used to offer streaming compensation. The used VMs in the same cloud datacenter constitute a VM cluster. Each VM cluster is responsible for a service domain (VMSD), and each group member belongs to a specific VMSD. The data source delivers the multicast data to MVMs through a reliable path, and MVMs further disseminate the data to group members along domain overlay multicast trees. The above approach structurally improves the stability of the overlay multicast tree. We further utilized CVM-based streaming compensation to enhance the stability of the data distribution in the VMSDs. VMCast can be used as an extension to existing tree-based overlay multicast solutions, to provide better services for media streaming applications. We applied VMCast to two application instances (i.e., HMTP and HCcast). The results show that it can obviously enhance the stability of the data distribution. PMID:26562152
VMCast: A VM-Assisted Stability Enhancing Solution for Tree-Based Overlay Multicast.
Gu, Weidong; Zhang, Xinchang; Gong, Bin; Zhang, Wei; Wang, Lu
2015-01-01
Tree-based overlay multicast is an effective group communication method for media streaming applications. However, a group member's departure causes all of its descendants to be disconnected from the multicast tree for some time, which results in poor performance. The above problem is difficult to be addressed because overlay multicast tree is intrinsically instable. In this paper, we proposed a novel stability enhancing solution, VMCast, for tree-based overlay multicast. This solution uses two types of on-demand cloud virtual machines (VMs), i.e., multicast VMs (MVMs) and compensation VMs (CVMs). MVMs are used to disseminate the multicast data, whereas CVMs are used to offer streaming compensation. The used VMs in the same cloud datacenter constitute a VM cluster. Each VM cluster is responsible for a service domain (VMSD), and each group member belongs to a specific VMSD. The data source delivers the multicast data to MVMs through a reliable path, and MVMs further disseminate the data to group members along domain overlay multicast trees. The above approach structurally improves the stability of the overlay multicast tree. We further utilized CVM-based streaming compensation to enhance the stability of the data distribution in the VMSDs. VMCast can be used as an extension to existing tree-based overlay multicast solutions, to provide better services for media streaming applications. We applied VMCast to two application instances (i.e., HMTP and HCcast). The results show that it can obviously enhance the stability of the data distribution.
Advanced helmet mounted display (AHMD)
NASA Astrophysics Data System (ADS)
Sisodia, Ashok; Bayer, Michael; Townley-Smith, Paul; Nash, Brian; Little, Jay; Cassarly, William; Gupta, Anurag
2007-04-01
Due to significantly increased U.S. military involvement in deterrent, observer, security, peacekeeping and combat roles around the world, the military expects significant future growth in the demand for deployable virtual reality trainers with networked simulation capability of the battle space visualization process. The use of HMD technology in simulated virtual environments has been initiated by the demand for more effective training tools. The AHMD overlays computer-generated data (symbology, synthetic imagery, enhanced imagery) augmented with actual and simulated visible environment. The AHMD can be used to support deployable reconfigurable training solutions as well as traditional simulation requirements, UAV augmented reality, air traffic control and Command, Control, Communications, Computers, Intelligence, Surveillance, and Reconnaissance (C4ISR) applications. This paper will describe the design improvements implemented for production of the AHMD System.
Process for fabricating continuous lengths of superconductor
Kroeger, Donald M.; List, III, Frederick A.
1998-01-01
A process for manufacturing a superconductor. The process is accomplished by depositing a superconductor precursor powder on a continuous length of a first substrate ribbon, overlaying a continuous length of a second substrate ribbon on said first substrate ribbon, and applying sufficient pressure to form a bound layered superconductor precursor between said first substrate ribbon and said second substrates ribbon. The layered superconductor precursor is then heat treated to form a super conductor layer.
NASA Astrophysics Data System (ADS)
Davias, M. E.; Gilbride, J. L.
2011-12-01
Aerial photographs of Carolina bays taken in the 1930's sparked the initial research into their geomorphology. Satellite Imagery available today through the Google Earth Virtual Globe facility expands the regions available for interrogation, but reveal only part of their unique planforms. Digital Elevation Maps (DEMs), using Light Detection And Ranging (LiDAR) remote sensing data, accentuate the visual presentation of these aligned ovoid shallow basins by emphasizing their robust circumpheral rims. To support a geospatial survey of Carolina bay landforms in the continental USA, 400,000 km2 of hsv-shaded DEMs were created as KML-JPEG tile sets. A majority of these DEMs were generated with LiDAR-derived data. We demonstrate the tile generation process and their integration into Google Earth, where the DEMs augment available photographic imagery for the visualization of bay planforms. While the generic Carolina bay planform is considered oval, we document subtle regional variations. Using a small set of empirically derived planform shapes, we created corresponding Google Earth overlay templates. We demonstrate the analysis of an individual Carolina bay by placing an appropriate overlay onto the virtually globe, then orientating, sizing and rotating it by edit handles such that it satisfactorily represents the bay's rim. The resulting overlay data element is extracted from Google Earth's object directory and programmatically processed to generate metrics such as geographic location, elevation, major and minor axis and inferred orientation. Utilizing a virtual globe facility for data capture may result in higher quality data compared to methods that reference flat maps, where geospatial shape and orientation of the bays could be skewed and distorted in the orthographic projection process. Using the methodology described, we have measured over 25k distinct Carolina bays. We discuss the Google Fusion geospatial data repository facility, through which these data have been assembled and made web-accessible to other researchers. Preliminary findings from the survey are discussed, such as how bay surface area, eccentricity and orientation vary across ~800 1/4° × 1/4° grid elements. Future work includes measuring 25k additional bays, as well as interrogation of the orientation data to identify any possible systematic geospatial relationships.
Energy barrier analysis of Nd-Fe-B thin films
NASA Astrophysics Data System (ADS)
Goto, R.; Okamoto, S.; Kikuchi, N.; Kitakami, O.
2015-05-01
The magnetization reversal mechanism of a permanent magnet has long been a controversial issue, which is closely related to the so-called coercivity problem. It is well known that the energy barrier for magnetization reversal contains essential information on reversal process. In this study, we propose a method to analyze the energy barrier function for the magnetization reversal. Preferentially (001) oriented Nd-Fe-B films with and without a Nd overlayer are used as model magnets. By combining the magnetic viscosity and time dependent coercivity measurements, the barrier function has been successfully evaluated. As a result, although the Nd-Fe-B films with and without Nd overlayer exhibit different magnetic behaviors, the power indices for their energy barrier are almost the same, suggesting that the magnetization reversal proceeds in a similar mode.
Materials selection for kraft batch digesters
DOE Office of Scientific and Technical Information (OSTI.GOV)
Wensley, A.; Moskal, M.; Wilton, W.
1997-08-01
Several candidate materials were evaluated by corrosion testing in autoclaves containing white and black liquors for batch digesters. The relationship between corrosion rate and corrosion potential was determined for ASTM SA516-Grade 70 carbon steel, UNS S30403 (Type 304L) austenitic stainless steel, UNS S31803 (2205) and UNS S32550 (2605) duplex stainless steels, and two stainless steel weld overlays, applied by the GMAW (gas metal arc welding) and SAW (submerged arc welding) processes. The tests revealed that SA516-Grade 70 carbon steel and type 304L stainless steel can experience high rates of corrosion. For the duplex stainless steels and weld overlays, corrosion resistancemore » improved with chromium content. A chromium content of at least 25% was found to be necessary for good corrosion resistance.« less
75 FR 57376 - Modification of Class B Airspace; Chicago, IL
Federal Register 2010, 2011, 2012, 2013, 2014
2010-09-21
... multiple Soaring Clubs in the area, requested that the floor of Area F be raised to 5,000 feet mean sea... designed to ensure it does not encompass or overlay the airfields where the Sky Soaring Glider Club (Hampshire, IL) and the Windy City Soaring Association (Hinkley, IL) operations are located; as well as the...
Chris C. Maguire; W. Thomas Adams; Rick G. Kelsey
2005-01-01
As highlighted in previous chapters, the primary biological objectives of CFIRP were to assess impacts of diverse silvicultural treatments on vegetation structure and growth and on the abundance and diversity of wildlife. Stand conditions resulting from implementation of the CFIRP research design, however, provided for the overlay of additional research projects that...
DOT National Transportation Integrated Search
2001-09-01
Saw and Seal is the process of introducing uniformly spaced saw joints to a bituminous : overlay in an attempt to eliminate or retard the formation of thermal and /or reflective : cracking. : Saw and Seal technology has been experimented with f...
DOT National Transportation Integrated Search
2004-08-01
Saw and Seal is the process of introducing uniformly spaced saw joints to a bituminous overlay in an : attempt to eliminate or retard the formation of thermal and /or reflective cracking. : Saw and Seal technology has been experimented with for...
Advanced Metalworking Solutions for Naval Systems That Go in Harm’s Way
2008-01-01
and stress corrosion cracking failures; unique processes using compacted titanium powders that are subsequently flowformed into piping, thereby...damping characteristics, adhesion strengths in peel and shock, toxicity, flame retardancy and others. Alternate cladding techniques are being...which produces a high-quality clad overlay but at a low deposition rate relative to other cladding processes. NMC and the project team will
DFT study on bimetallic Pt/Cu(1 1 1) as efficient catalyst for H2 dissociation
NASA Astrophysics Data System (ADS)
Liu, Ji; Fan, Xiaofeng; Sun, Chang Q.; Zhu, Weiguang
2018-05-01
To design a catalyst for the dissociation of H2 with better CO-tolerance performance is very important for proton exchange membrane fuel cells (PEMFCs) towards high efficiency. With slab model, the catalytic properties of overlayer Pt on Cu substrate (Pt/Cu) are analyzed by first-principle calculations. The CO saturation coverage (40%) on Pt2/Cu is found to be lower than that of pure Pt (about 75%). The dissociation barrier from H2 to H is less than 0.4 eV under the saturation coverage of CO. On the basis of kinetics of proton formation, the CO-tolerance ability on double-layer Pt with Cu is found to be greatly improved compared with that on pure Pt. It is expected that Pt overlayer on Cu(1 1 1) is a potential anode material with lower cost for PEMFCs.
Chen, Yunzhong; Green, Robert J; Sutarto, Ronny; He, Feizhou; Linderoth, Søren; Sawatzky, George A; Pryds, Nini
2017-11-08
Polar discontinuities and redox reactions provide alternative paths to create two-dimensional electron liquids (2DELs) at oxide interfaces. Herein, we report high mobility 2DELs at interfaces involving SrTiO 3 (STO) achieved using polar La 7/8 Sr 1/8 MnO 3 (LSMO) buffer layers to manipulate both polarities and redox reactions from disordered overlayers grown at room temperature. Using resonant X-ray reflectometry experiments, we quantify redox reactions from oxide overlayers on STO as well as polarity induced electronic reconstruction at epitaxial LSMO/STO interfaces. The analysis reveals how these effects can be combined in a STO/LSMO/disordered film trilayer system to yield high mobility modulation doped 2DELs, where the buffer layer undergoes a partial transformation from perovskite to brownmillerite structure. This uncovered interplay between polar discontinuities and redox reactions via buffer layers provides a new approach for the design of functional oxide interfaces.
Valentine, Paul; Edwards, Doreen D.; Walker, Jr., William John; Slack, Lyle H.; Brown, Wayne Douglas; Osborne, Cathy; Norton, Michael; Begley, Richard
2010-05-18
A light-emitting ceramic based panel, hereafter termed "electroceramescent" panel, is herein claimed. The electroceramescent panel is formed on a substrate providing mechanical support as well as serving as the base electrode for the device. One or more semiconductive ceramic layers directly overlay the substrate, and electrical conductivity and ionic diffusion are controlled. Light emitting regions overlay the semiconductive ceramic layers, and said regions consist sequentially of a layer of a ceramic insulation layer and an electroluminescent layer, comprised of doped phosphors or the equivalent. One or more conductive top electrode layers having optically transmissive areas overlay the light emitting regions, and a multi-layered top barrier cover comprising one or more optically transmissive non-combustible insulation layers overlay said top electrode regions.
NASA Technical Reports Server (NTRS)
Hunt, W. D.; Brennan, K. F.; Summers, C. J.; Cameron, Thomas P.
1996-01-01
This thesis addresses the acoustoelectric issues concerning the amplification of surface acoustic waves (SAWs) and the reflection of SAWs from slanted reflector gratings on GaAs, with application to a novel acoustic charge transport (ACT) device architecture. First a simple model of the SAWAMP was developed, which was subsequently used to define the epitaxially grown material structure necessary to provide simultaneously high resistance and high electron mobility. In addition, a segmented SAWAMP structure was explored with line widths on the order of an acoustic wavelength. This resulted in the demonstration of SAWAMPS with an order of magnitude less voltage and power requirements than previously reported devices. A two-dimensional model was developed to explain the performance of devices with charge confinement layers less then 0.5 mm, which was experimentally verified. This model was extended to predict a greatly increased gain from the addition of a ZnO overlay. These overlays were experimentally attempted, but no working devices were reported due to process incompatibilities. In addition to the SAWAMP research, the reflection of SAWs from slanted gratings on GaAs was also studied and experimentally determined reflection coefficients for both 45 deg grooves and Al stripes on GaAs have been reported for the first time. The SAWAMp and reflector gratings were combined to investigate the integrated ring oscillator for application to the proposed ACT device and design parameters for this device have been provided.
A Scalable Approach for Discovering Conserved Active Subnetworks across Species
Verfaillie, Catherine M.; Hu, Wei-Shou; Myers, Chad L.
2010-01-01
Overlaying differential changes in gene expression on protein interaction networks has proven to be a useful approach to interpreting the cell's dynamic response to a changing environment. Despite successes in finding active subnetworks in the context of a single species, the idea of overlaying lists of differentially expressed genes on networks has not yet been extended to support the analysis of multiple species' interaction networks. To address this problem, we designed a scalable, cross-species network search algorithm, neXus (Network - cross(X)-species - Search), that discovers conserved, active subnetworks based on parallel differential expression studies in multiple species. Our approach leverages functional linkage networks, which provide more comprehensive coverage of functional relationships than physical interaction networks by combining heterogeneous types of genomic data. We applied our cross-species approach to identify conserved modules that are differentially active in stem cells relative to differentiated cells based on parallel gene expression studies and functional linkage networks from mouse and human. We find hundreds of conserved active subnetworks enriched for stem cell-associated functions such as cell cycle, DNA repair, and chromatin modification processes. Using a variation of this approach, we also find a number of species-specific networks, which likely reflect mechanisms of stem cell function that have diverged between mouse and human. We assess the statistical significance of the subnetworks by comparing them with subnetworks discovered on random permutations of the differential expression data. We also describe several case examples that illustrate the utility of comparative analysis of active subnetworks. PMID:21170309
A Preliminary Study of Building a Transmission Overlay for Regional US Power Grid
DOE Office of Scientific and Technical Information (OSTI.GOV)
Lei, Yin; Li, Yalong; Liu, Yilu
2015-01-01
Many European countries have taken steps toward a Supergrid in order to transmit large amount of intermittent and remote renewable energy over long distance to load centers. In the US, as the expected increase in renewable generation and electricity demand, similar problem arises. A potential solution is to upgrade the transmission system at a higher voltage by constructing a new overlay grid. This paper will first address basic requirements for such an overlay grid. Potential transmission technologies will also be discussed. A multi-terminal VSC HVDC model is developed in DSATools to implement the overlay grid and a test case onmore » a regional NPCC system will be simulated. Another test system of entire US power grid, with three different interconnections tied together using back-to-back HVDC, is also introduced in this paper. Building an overlay system on top of this test case is ongoing, and will be discussed in future work.« less
Vertical electrical impedance evaluation of asphalt overlays on concrete bridge decks
NASA Astrophysics Data System (ADS)
Baxter, Jared S.; Guthrie, W. Spencer; Waters, Tenli; Barton, Jeffrey D.; Mazzeo, Brian A.
2018-04-01
Vertical electrical impedance scanning of concrete bridge decks is a non-destructive method for quantifying the degree of protection provided to steel reinforcement against the ingress of corrosive agents. Four concrete bridge decks with asphalt overlays in northern Utah were evaluated using scanning vertical electrical impedance measurements in this study. At the time of testing, the bridges ranged in age from 21 to 34 years, and asphalt overlays had been in place for 7 to 22 years, depending on the bridge. Electrical impedance measurements were collected using a previously constructed apparatus that consisted of six probes spanning a transverse distance of 12 ft. The impedance measurements were compared to surface cracking observations and cores obtained from the same four bridge decks. The results presented in this paper demonstrate the utility of scanning vertical electrical impedance measurements for detecting cracks in asphalt overlays and quantifying their severity. In addition, the results demonstrate the sensitivity of impedance measurements to the presence of an intact membrane beneath the asphalt overlay.
Study of μDBO overlay target size reduction for application broadening
NASA Astrophysics Data System (ADS)
Calado, Victor; Dépré, Jérôme; Massacrier, Clément; Tarabrin, Sergey; van Haren, Richard; Dettoni, Florent; Bouyssou, Régis; Dezauzier, Christophe
2018-03-01
With these proceedings we present μ-diffraction-based overlay (μDBO) targets that are well below the currently supported minimum size of 10×10 μm2 . We have been capable of measuring overlay targets as small as 4×4 μm2 with our latest generation YieldStar system. Furthermore we find an excellent precision (TMU < 0.33 nm for 6 × 6 μm2 ) without any compromise on throughput (MAM time < 60 ms). At last a study that compares four generations of YieldStar systems show clearly that the latest generation YieldStar systems is much better capable of reading small overlay targets such that the performance of a 16 × 16 μm2 on an early generation YieldStar 2nd-gen is comparable to that of a 8 × 8 μm2 on the latest YieldStar 5th-gen. This work enables a smaller metrology footprint, more placement flexibility and in-die overlay metrology solutions.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Malik, I.J.; Hrbek, J.
1991-05-01
We studied adsorbed Ru{sub 3}(CO){sub 12} and Mo (CO){sub 6} overlayers on Ru(001) and Au/Ru surfaces by infrared reflection--absorption spectroscopy (IRAS) and thermal desorption spectroscopy (TDS). We characterized the C--O stretching mode of both metal carbonyls (4 cm{sup {minus}1} FWHM) and a deformation mode of Mo (CO){sub 6} at 608 cm{sup {minus}1} with an unusually narrow FWHM of 1 cm{sup {minus}1}. Both IRAS and TDS data suggest adsorption and desorption of metal carbonyls as molecular species with a preferential orientation in the overlayers. We discuss annealing experiments of Ru{sub 3}(CO){sub 12}/Ru(001), the interaction of Ru{sub 3}(CO){sub 12} overlayers with electronsmore » of up to 100-eV energy, and the interaction of Mo (CO){sub 6} overlayers with 300-nm photons.« less
Optimizing Training Event Schedules at Naval Air Station Fallon
2018-03-01
popularly known as Topgun. Fallon training range airspace overlays 10,200 square miles and contains ground ranges for bombing and electronic warfare. In...Fighter Weapons School, popularly known as Topgun. Fallon training range airspace overlays 10,200 square miles and contains ground ranges for bombing and...popularly known as Topgun. Fallon training range airspace overlays 10,200 squaremiles, and contains ground ranges for bombing and electronic warfare. In
Cloud Computing at the Tactical Edge
2012-10-01
Cloud Computing (CloudCom ’09). Bejing , China , December 2009. Springer-Verlag, 2009. [Marinelli 2009] Marinelli, E. Hyrax: Cloud Computing on Mobile...offloading is appropriate. Each applica- tion overlay is generated from the same Base VM Image that resides in the cloudlet. In an opera - tional setting...overlay, the following opera - tions execute: 1. The overlay is decompressed using the tools listed in Section 4.2. 2. VM synthesis is performed through
The challenges of transitioning from linear to high-order overlay control in advanced lithography
NASA Astrophysics Data System (ADS)
Adel, M.; Izikson, P.; Tien, D.; Huang, C. K.; Robinson, J. C.; Eichelberger, B.
2008-03-01
In the lithography section of the ITRS 2006 update, at the top of the list of difficult challenges appears the text "overlay of multiple exposures including mask image placement". This is a reflection of the fact that today overlay is becoming a major yield risk factor in semiconductor manufacturing. Historically, lithographers have achieved sufficient alignment accuracy and hence layer to layer overlay control by relying on models which define overlay as a linear function of the field and wafer coordinates. These linear terms were easily translated to correctibles in the available exposure tool degrees of freedom on the wafer and reticle stages. However, as the 45 nm half pitch node reaches production, exposure tool vendors have begun to make available, and lithographers have begun to utilize so called high order wafer and field control, in which either look up table or high order polynomial models are modified on a product by product basis. In this paper, the major challenges of this transition will be described. It will include characterization of the sources of variation which need to be controlled by these new models and the overlay and alignment sampling optimization problem which needs to be addressed, while maintaining the ever tightening demands on productivity and cost of ownership.
Yeo, Caitlin T; Ungi, Tamas; U-Thainual, Paweena; Lasso, Andras; McGraw, Robert C; Fichtinger, Gabor
2011-07-01
The purpose of this study was to determine if augmented reality image overlay and laser guidance systems can assist medical trainees in learning the correct placement of a needle for percutaneous facet joint injection. The Perk Station training suite was used to conduct and record the needle insertion procedures. A total of 40 volunteers were randomized into two groups of 20. 1) The Overlay group received a training session that consisted of four insertions with image and laser guidance, followed by two insertions with laser overlay only. 2) The Control group received a training session of six classical freehand insertions. Both groups then conducted two freehand insertions. The movement of the needle was tracked during the series of insertions. The final insertion procedure was assessed to determine if there was a benefit to the overlay method compared to the freehand insertions. The Overlay group had a better success rate (83.3% versus 68.4%, p=0.002), and potential for less tissue damage as measured by the amount of needle movement inside the phantom (3077.6 mm(2) versus 5607.9 mm(2) , p =0.01). These results suggest that an augmented reality overlay guidance system can assist medical trainees in acquiring technical competence in a percutaneous needle insertion procedure. © 2011 IEEE
Reduction of image-based ADI-to-AEI overlay inconsistency with improved algorithm
NASA Astrophysics Data System (ADS)
Chen, Yen-Liang; Lin, Shu-Hong; Chen, Kai-Hsiung; Ke, Chih-Ming; Gau, Tsai-Sheng
2013-04-01
In image-based overlay (IBO) measurement, the measurement quality of various measurement spectra can be judged by quality indicators and also the ADI-to-AEI similarity to determine the optimum light spectrum. However we found some IBO measured results showing erroneous indication of wafer expansion from the difference between the ADI and the AEI maps, even after their measurement spectra were optimized. To reduce this inconsistency, an improved image calculation algorithm is proposed in this paper. Different gray levels composed of inner- and outer-box contours are extracted to calculate their ADI overlay errors. The symmetry of intensity distribution at the thresholds dictated by a range of gray levels is used to determine the particular gray level that can minimize the ADI-to-AEI overlay inconsistency. After this improvement, the ADI is more similar to AEI with less expansion difference. The same wafer was also checked by the diffraction-based overlay (DBO) tool to verify that there is no physical wafer expansion. When there is actual wafer expansion induced by large internal stress, both the IBO and the DBO measurements indicate similar expansion results. The scanning white-light interference microscope was used to check the variation of wafer warpage during the ADI and AEI stages. It predicts a similar trend with the overlay difference map, confirming the internal stress.
Self-aligned blocking integration demonstration for critical sub-40nm pitch Mx level patterning
NASA Astrophysics Data System (ADS)
Raley, Angélique; Mohanty, Nihar; Sun, Xinghua; Farrell, Richard A.; Smith, Jeffrey T.; Ko, Akiteru; Metz, Andrew W.; Biolsi, Peter; Devilliers, Anton
2017-04-01
Multipatterning has enabled continued scaling of chip technology at the 28nm node and beyond. Selfaligned double patterning (SADP) and self-aligned quadruple patterning (SAQP) as well as Litho- Etch/Litho-Etch (LELE) iterations are widely used in the semiconductor industry to enable patterning at sub 193 immersion lithography resolutions for layers such as FIN, Gate and critical Metal lines. Multipatterning requires the use of multiple masks which is costly and increases process complexity as well as edge placement error variation driven mostly by overlay. To mitigate the strict overlay requirements for advanced technology nodes (7nm and below), a self-aligned blocking integration is desirable. This integration trades off the overlay requirement for an etch selectivity requirement and enables the cut mask overlay tolerance to be relaxed from half pitch to three times half pitch. Selfalignement has become the latest trend to enable scaling and self-aligned integrations are being pursued and investigated for various critical layers such as contact, via, metal patterning. In this paper we propose and demonstrate a low cost flexible self-aligned blocking strategy for critical metal layer patterning for 7nm and beyond from mask assembly to low -K dielectric etch. The integration is based on a 40nm pitch SADP flow with 2 cut masks compatible with either cut or block integration and employs dielectric films widely used in the back end of the line. As a consequence this approach is compatible with traditional etch, deposition and cleans tools that are optimized for dielectric etches. We will review the critical steps and selectivities required to enable this integration along with bench-marking of each integration option (cut vs. block).
DOT National Transportation Integrated Search
1999-08-01
"Saw and Seal" is the process of introducing uniformly spaced saw joints to a bituminous : overlay in an attempt to eliminate or retard the formation of thermal and /or reflective : cracking. : Saw and Seal technology has been experimented with for m...
ERIC Educational Resources Information Center
Kim, Ann
2005-01-01
Necessity is still the mother of invention, and physical processing is a reality for most libraries. Ergo, the inevitable development of Indigo Media and its innovative MediaPrint software, which allows distributors to overlay customized labels, logos, barcodes, and artwork onto retail labels of audiobooks, CDs, VHS tapes, DVDs, and CD-ROMs, on a…
Protocol for Initial Purification of Bacteriocin
2015-10-01
lysate/extract preparation, column purification, and a desalting . The peptide was tracked throughout the process using a soft agar overlay activity...tris PAGE. It is necessary to desalt those samples for 150-mM and 1-M fractions, by using dialysis or G10 sephadex columns, in order to prevent
NASA Astrophysics Data System (ADS)
Bandanadjaja, Beny; Purwadi, Wiwik; Idamayanti, Dewi; Lilansa, Noval; Hanaldi, Kus; Nurzaenal, Friya Kurnia
2018-05-01
Hard metal castings are widely used in the coal mill pulverizer as construction material for coal crushers. During its operation crushers and mills experience degradation caused by abrasion load. This research dealed with the surface overlaying of similiar material on the surface of white cast iron by mean of gravity casting. The die blank casting was preheated prior to the casting process of outer layer made of Ni-Hard white cast iron to guarantee bonding processes and avoid any crack. The preheating temperature of die blankin ther range of 500C up to 850C was set up to reach the interface temperature in the range of 887°C -1198°C and the flushing time was varied between 10-20 seconds. Studies carried on the microstructure of sample material revealed a formation of metallurgical bonding at the preheating temperature above 625 °C by pouring temperature ranging from 1438 °C to 1468 °C. Metallographical and chemical composition by mean of EDS examination were performed to observed the resut. This research concludes that the casting of Ni-Hard 1 overlay by applying gravity casting method can be done by preheating the surface of casting to 625 °C, interface temperature of 1150 °C, flushing time of 7 seconds and pouring temperature of 1430 °C. Excellent metallurgical bonding at the contact area between dieblank and overlay material has been achieved in which there is no parting line at the interface area to be observed.
NASA Technical Reports Server (NTRS)
Torgerson, Jordan L.; Clare, Loren P.; Pang, Jackson
2011-01-01
The Interplanetary Overlay Net - working Protocol Accelerator (IONAC) described previously in The Inter - planetary Overlay Networking Protocol Accelerator (NPO-45584), NASA Tech Briefs, Vol. 32, No. 10, (October 2008) p. 106 (http://www.techbriefs.com/component/ content/article/3317) provides functions that implement the Delay Tolerant Networking (DTN) bundle protocol. New missions that require high-speed downlink-only use of DTN can now be accommodated by the unidirectional IONAC-Lite to support high data rate downlink mission applications. Due to constrained energy resources, a conventional software implementation of the DTN protocol can provide only limited throughput for any given reasonable energy consumption rate. The IONAC-Lite DTN Protocol Accelerator is able to reduce this energy consumption by an order of magnitude and increase the throughput capability by two orders of magnitude. In addition, a conventional DTN implementation requires a bundle database with a considerable storage requirement. In very high downlink datarate missions such as near-Earth radar science missions, the storage space utilization needs to be maximized for science data and minimized for communications protocol-related storage needs. The IONAC-Lite DTN Protocol Accelerator is implemented in a reconfigurable hardware device to accomplish exactly what s needed for high-throughput DTN downlink-only scenarios. The following are salient features of the IONAC-Lite implementation: An implementation of the Bundle Protocol for an environment that requires a very high rate bundle egress data rate. The C&DH (command and data handling) subsystem is also expected to be very constrained so the interaction with the C&DH processor and the temporary storage are minimized. Fully pipelined design so that bundle processing database is not required. Implements a lookup table-based approach to eliminate multi-pass processing requirement imposed by the Bundle Protocol header s length field structure and the SDNV (self-delimiting numeric value) data field formatting. 8-bit parallel datapath to support high data-rate missions. Reduced resource utilization implementation for missions that do not require custody transfer features. There was no known implementation of the DTN protocol in a field programmable gate array (FPGA) device prior to the current implementation. The combination of energy and performance optimization that embodies this design makes the work novel.
Precise design-based defect characterization and root cause analysis
NASA Astrophysics Data System (ADS)
Xie, Qian; Venkatachalam, Panneerselvam; Lee, Julie; Chen, Zhijin; Zafar, Khurram
2017-03-01
As semiconductor manufacturing continues its march towards more advanced technology nodes, it becomes increasingly important to identify and characterize design weak points, which is typically done using a combination of inline inspection data and the physical layout (or design). However, the employed methodologies have been somewhat imprecise, relying greatly on statistical techniques to signal excursions. For example, defect location error that is inherent to inspection tools prevents them from reporting the true locations of defects. Therefore, common operations such as background-based binning that are designed to identify frequently failing patterns cannot reliably identify specific weak patterns. They can only identify an approximate set of possible weak patterns, but within these sets there are many perfectly good patterns. Additionally, characterizing the failure rate of a known weak pattern based on inline inspection data also has a lot of fuzziness due to coordinate uncertainty. SEM (Scanning Electron Microscope) Review attempts to come to the rescue by capturing high resolution images of the regions surrounding the reported defect locations, but SEM images are reviewed by human operators and the weak patterns revealed in those images must be manually identified and classified. Compounding the problem is the fact that a single Review SEM image may contain multiple defective patterns and several of those patterns might not appear defective to the human eye. In this paper we describe a significantly improved methodology that brings advanced computer image processing and design-overlay techniques to better address the challenges posed by today's leading technology nodes. Specifically, new software techniques allow the computer to analyze Review SEM images in detail, to overlay those images with reference design to detect every defect that might be present in all regions of interest within the overlaid reference design (including several classes of defects that human operators will typically miss), to obtain the exact defect location on design, to compare all defective patterns thus detected against a library of known patterns, and to classify all defective patterns as either new or known. By applying the computer to these tasks, we automate the entire process from defective pattern identification to pattern classification with high precision, and we perform this operation en masse during R & D, ramp, and volume production. By adopting the methodology, whenever a specific weak pattern is identified, we are able to run a series of characterization operations to ultimately arrive at the root cause. These characterization operations can include (a) searching all pre-existing Review SEM images for the presence of the specific weak pattern to determine whether there is any spatial (within die or within wafer) or temporal (within any particular date range, before or after a mask revision, etc.) correlation and (b) understanding the failure rate of the specific weak pattern to prioritize the urgency of the problem, (c) comparing the weak pattern against an OPC (Optical Procimity Correction) Verification report or a PWQ (Process Window Qualification)/FEM (Focus Exposure Matrix) result to assess the likelihood of it being a litho-sensitive pattern, etc. After resolving the specific weak pattern, we will categorize it as known pattern, and the engineer will move forward with discovering new weak patterns.
NASA Technical Reports Server (NTRS)
Ha, Tri T.; Pratt, Timothy
1989-01-01
The feasibility of using spread spectrum techniques to provide a low-cost multiple access system for a very large number of low data terminals was investigated. Two applications of spread spectrum technology to very small aperture terminal (VSAT) satellite communication networks are presented. Two spread spectrum multiple access systems which use a form of noncoherent M-ary FSK (MFSK) as the primary modulation are described and the throughput analyzed. The analysis considers such factors as satellite power constraints and adjacent satellite interference. Also considered is the effect of on-board processing on the multiple access efficiency and the feasibility of overlaying low data rate spread spectrum signals on existing satellite traffic as a form of frequency reuse is investigated. The use of chirp is examined for spread spectrum communications. In a chirp communication system, each data bit is converted into one or more up or down sweeps of frequency, which spread the RF energy across a broad range of frequencies. Several different forms of chirp communication systems are considered, and a multiple-chirp coded system is proposed for overlay service. The mutual interference problem is examined in detail and a performance analysis undertaken for the case of a chirp data channel overlaid on a video channel.
Sol-Gel-Based Titania-Silica Thin Film Overlay for Long Period Fiber Grating-Based Biosensors.
Chiavaioli, Francesco; Biswas, Palas; Trono, Cosimo; Jana, Sunirmal; Bandyopadhyay, Somnath; Basumallick, Nandini; Giannetti, Ambra; Tombelli, Sara; Bera, Susanta; Mallick, Aparajita; Baldini, Francesco
2015-12-15
An evanescent wave optical fiber biosensor based on titania-silica-coated long period grating (LPG) is presented. The chemical overlay, which increases the refractive index (RI) sensitivity of the sensor, consists of a sol-gel-based titania-silica thin film, deposited along the sensing portion of the fiber by means of the dip-coating technique. Changing both the sol viscosity and the withdrawal speed during the dip-coating made it possible to adjust the thickness of the film overlay, which is a crucial parameter for the sensor performance. After the functionalization of the fiber surface using a methacrylic acid/methacrylate copolymer, an antibody/antigen (IgG/anti-IgG) assay was carried out to assess the performance of sol-gel based titania-silica-coated LPGs as biosensors. The analyte concentration was determined from the wavelength shift at the end of the binding process and from the initial binding rate. This is the first time that a sol-gel based titania-silica-coated LPG is proposed as an effective and feasible label-free biosensor. The specificity of the sensor was validated by performing the same model assay after spiking anti-IgG into human serum. With this structured LPG, detection limits of the order of tens of micrograms per liter (10(-11) M) are attained.
Automatic pattern localization across layout database and photolithography mask
NASA Astrophysics Data System (ADS)
Morey, Philippe; Brault, Frederic; Beisser, Eric; Ache, Oliver; Röth, Klaus-Dieter
2016-03-01
Advanced process photolithography masks require more and more controls for registration versus design and critical dimension uniformity (CDU). The distribution of the measurement points should be distributed all over the whole mask and may be denser in areas critical to wafer overlay requirements. This means that some, if not many, of theses controls should be made inside the customer die and may use non-dedicated patterns. It is then mandatory to access the original layout database to select patterns for the metrology process. Finding hundreds of relevant patterns in a database containing billions of polygons may be possible, but in addition, it is mandatory to create the complete metrology job fast and reliable. Combining, on one hand, a software expertise in mask databases processing and, on the other hand, advanced skills in control and registration equipment, we have developed a Mask Dataprep Station able to select an appropriate number of measurement targets and their positions in a huge database and automatically create measurement jobs on the corresponding area on the mask for the registration metrology system. In addition, the required design clips are generated from the database in order to perform the rendering procedure on the metrology system. This new methodology has been validated on real production line for the most advanced process. This paper presents the main challenges that we have faced, as well as some results on the global performances.
Study of nanoimprint lithography (NIL) for HVM of memory devices
NASA Astrophysics Data System (ADS)
Kono, Takuya; Hatano, Masayuki; Tokue, Hiroshi; Kobayashi, Kei; Suzuki, Masato; Fukuhara, Kazuya; Asano, Masafumi; Nakasugi, Tetsuro; Choi, Eun Hyuk; Jung, Wooyung
2017-03-01
A low cost alternative lithographic technology is desired to meet the decreasing feature size of semiconductor devices. Nano-imprint lithography (NIL) is one of the candidates for alternative lithographic technologies.[1][2][3] NIL has such advantages as good resolution, critical dimension (CD) uniformity and low line edge roughness (LER). On the other hand, the critical issues of NIL are defectivity, overlay, and throughput. In order to introduce NIL into the HVM, it is necessary to overcome these three challenges simultaneously.[4]-[12] In our previous study, we have reported a dramatic improvement in NIL process defectivity on a pilot line tool, FPA-1100 NZ2. We have described that the NIL process for 2x nm half pitch is getting closer to the target of HVM.[12] In this study, we report the recent evaluation of the NIL process performance to judge the applicability of NIL to memory device fabrications. In detail, the CD uniformity and LER are found to be less than 2nm. The overlay accuracy of the test device is less than 7nm. A defectivity level of below 1pcs./cm2 has been achieved at a throughput of 15 wafers per hour.
Programing Procedures Manual (PPM).
1981-12-15
terms ’reel’, ’unit’, and ’volume’ are synonymous and completely interchangeable in the CLOSE statement. Treatment of sequential mass storage files is...logically equivalent to the treatment of a file on tape or analogous sequential media. * For the purpose of showing the effect of various types of CLOSE...Overlay Area CA6 Address of Abend Relative to beginning of overlay segment The programer can now refer to the compile source listing for the overlay
2006-07-30
as an intervention . Readers with MIS symptoms read significantly faster with their chosen overlay than without it. These findings justify further...recent years, the techniques for routine diagnosis and effective intervention methods for MIS have been improved and developed. Although Irlen is...The British Royal Navy, for example, screens for MIS on a case-by-case basis and provides overlays and filters as intervention . Furthermore
Teng, Jie; Dumon, Pieter; Bogaerts, Wim; Zhang, Hongbo; Jian, Xigao; Han, Xiuyou; Zhao, Mingshan; Morthier, Geert; Baets, Roel
2009-08-17
Athermal silicon ring resonators are experimentally demonstrated by overlaying a polymer cladding on narrowed silicon wires. The ideal width to achieve athermal condition for the TE mode of 220 nm-height SOI waveguides is found to be around 350 nm. After overlaying a polymer layer, the wavelength temperature dependence of the silicon ring resonator is reduced to less than 5 pm/degrees C, almost eleven times less than that of normal silicon waveguides. The optical loss of a 350-nm bent waveguide (with a radius of 15 microm) is extracted from the ring transmission spectrum. The scattering loss is reduced to an acceptable level of about 50 dB/cm after overlaying a polymer cladding. (c) 2009 Optical Society of America
NASA Technical Reports Server (NTRS)
Cowings, Patricia S.; Naifeh, Karen; Thrasher, Chet
1988-01-01
This report contains the source code and documentation for a computer program used to process impedance cardiography data. The cardiodynamic measures derived from impedance cardiography are ventricular stroke column, cardiac output, cardiac index and Heather index. The program digitizes data collected from the Minnesota Impedance Cardiograph, Electrocardiography (ECG), and respiratory cycles and then stores these data on hard disk. It computes the cardiodynamic functions using interactive graphics and stores the means and standard deviations of each 15-sec data epoch on floppy disk. This software was designed on a Digital PRO380 microcomputer and used version 2.0 of P/OS, with (minimally) a 4-channel 16-bit analog/digital (A/D) converter. Applications software is written in FORTRAN 77, and uses Digital's Pro-Tool Kit Real Time Interface Library, CORE Graphic Library, and laboratory routines. Source code can be readily modified to accommodate alternative detection, A/D conversion and interactive graphics. The object code utilizing overlays and multitasking has a maximum of 50 Kbytes.
Interactive digital image manipulation system
NASA Technical Reports Server (NTRS)
Henze, J.; Dezur, R.
1975-01-01
The system is designed for manipulation, analysis, interpretation, and processing of a wide variety of image data. LANDSAT (ERTS) and other data in digital form can be input directly into the system. Photographic prints and transparencies are first converted to digital form with an on-line high-resolution microdensitometer. The system is implemented on a Hewlett-Packard 3000 computer with 128 K bytes of core memory and a 47.5 megabyte disk. It includes a true color display monitor, with processing memories, graphics overlays, and a movable cursor. Image data formats are flexible so that there is no restriction to a given set of remote sensors. Conversion between data types is available to provide a basis for comparison of the various data. Multispectral data is fully supported, and there is no restriction on the number of dimensions. In this way multispectral data collected at more than one point in time may simply be treated as a data collected with twice (three times, etc.) the number of sensors. There are various libraries of functions available to the user: processing functions, display functions, system functions, and earth resources applications functions.
Tai, Meng Wei; Chong, Zhen Feng; Asif, Muhammad Khan; Rahmat, Rabiah A; Nambiar, Phrabhakaran
2016-09-01
This study was to compare the suitability and precision of xerographic and computer-assisted methods for bite mark investigations. Eleven subjects were asked to bite on their forearm and the bite marks were photographically recorded. Alginate impressions of the subjects' dentition were taken and their casts were made using dental stone. The overlays generated by xerographic method were obtained by photocopying the subjects' casts and the incisal edge outlines were then transferred on a transparent sheet. The bite mark images were imported into Adobe Photoshop® software and printed to life-size. The bite mark analyses using xerographically generated overlays were done by comparing an overlay to the corresponding printed bite mark images manually. In computer-assisted method, the subjects' casts were scanned into Adobe Photoshop®. The bite mark analyses using computer-assisted overlay generation were done by matching an overlay and the corresponding bite mark images digitally using Adobe Photoshop®. Another comparison method was superimposing the cast images with corresponding bite mark images employing the Adobe Photoshop® CS6 and GIF-Animator©. A score with a range of 0-3 was given during analysis to each precision-determining criterion and the score was increased with better matching. The Kruskal Wallis H test showed significant difference between the three sets of data (H=18.761, p<0.05). In conclusion, bite mark analysis using the computer-assisted animated-superimposition method was the most accurate, followed by the computer-assisted overlay generation and lastly the xerographic method. The superior precision contributed by digital method is discernible despite the human skin being a poor recording medium of bite marks. Copyright © 2016 Elsevier Ireland Ltd. All rights reserved.
Managing Network Partitions in Structured P2P Networks
NASA Astrophysics Data System (ADS)
Shafaat, Tallat M.; Ghodsi, Ali; Haridi, Seif
Structured overlay networks form a major class of peer-to-peer systems, which are touted for their abilities to scale, tolerate failures, and self-manage. Any long-lived Internet-scale distributed system is destined to face network partitions. Consequently, the problem of network partitions and mergers is highly related to fault-tolerance and self-management in large-scale systems. This makes it a crucial requirement for building any structured peer-to-peer systems to be resilient to network partitions. Although the problem of network partitions and mergers is highly related to fault-tolerance and self-management in large-scale systems, it has hardly been studied in the context of structured peer-to-peer systems. Structured overlays have mainly been studied under churn (frequent joins/failures), which as a side effect solves the problem of network partitions, as it is similar to massive node failures. Yet, the crucial aspect of network mergers has been ignored. In fact, it has been claimed that ring-based structured overlay networks, which constitute the majority of the structured overlays, are intrinsically ill-suited for merging rings. In this chapter, we motivate the problem of network partitions and mergers in structured overlays. We discuss how a structured overlay can automatically detect a network partition and merger. We present an algorithm for merging multiple similar ring-based overlays when the underlying network merges. We examine the solution in dynamic conditions, showing how our solution is resilient to churn during the merger, something widely believed to be difficult or impossible. We evaluate the algorithm for various scenarios and show that even when falsely detecting a merger, the algorithm quickly terminates and does not clutter the network with many messages. The algorithm is flexible as the tradeoff between message complexity and time complexity can be adjusted by a parameter.
Park, Jiyoon; Woo, Ok Hee; Shin, Hye Seon; Cho, Kyu Ran; Seo, Bo Kyoung; Kang, Eun Young
2015-10-01
The purpose of this study is to evaluate the diagnostic performance of SWE in palpable breast mass and to compare with color overlay pattern in SWE with conventional US and quantitative SWE for assessing palpable breast mass. SWE and conventional breast US were performed in 133 women with 156 palpable breast lesions (81 benign, 75 malignant) between August 2013 to June 2014. Either pathology or periodic imaging surveillance more than 2 years was a reference standard. Existence of previous image was blinded to performing radiologists. US BI-RADS final assessment, qualitative and quantitative SWE measurements were evaluated. Diagnostic performances of grayscale US, SWE and US combined to SWE were calculated and compared. Correlation between pattern classification and quantitative SWE was evaluated. Both color overlay pattern and quantitative SWE improved the specificity of conventional US, from 81.48% to 96.30% (p=0.0005), without improvement in sensitivity. Color overlay pattern was significantly related to all quantitative SWE parameters and malignancy rate (p<0.0001.). The optimal cutoff of color overlay pattern was between 2 and 3. Emax with optimal cutoff at 45.1 kPa showed the highest Az value, sensitivity, specificity and accuracy among other quantitative SWE parameters (p<0.0001). Echogenic halo on grayscale US showed significant correlation with color overlay pattern and pathology (p<0.0001). In evaluation of palpable breast mass, conventional US combine to SWE improves specificity and reduces the number of biopsies that ultimately yield a benign result. Color overlay pattern classification is more quick and easy and may represent quantitative SWE measurements with similar diagnostic performances. Copyright © 2015 Elsevier Ireland Ltd. All rights reserved.
NASA Astrophysics Data System (ADS)
Bhattacharyya, Kaustuve; den Boef, Arie; Noot, Marc; Adam, Omer; Grzela, Grzegorz; Fuchs, Andreas; Jak, Martin; Liao, Sax; Chang, Ken; Couraudon, Vincent; Su, Eason; Tzeng, Wilson; Wang, Cathy; Fouquet, Christophe; Huang, Guo-Tsai; Chen, Kai-Hsiung; Wang, Y. C.; Cheng, Kevin; Ke, Chih-Ming; Terng, L. G.
2017-03-01
The optical coupling between gratings in diffraction-based overlay triggers a swing-curve1,6 like response of the target's signal contrast and overlay sensitivity through measurement wavelengths and polarizations. This means there are distinct measurement recipes (wavelength and polarization combinations) for a given target where signal contrast and overlay sensitivity are located at the optimal parts of the swing-curve that can provide accurate and robust measurements. Some of these optimal recipes can be the ideal choices of settings for production. The user has to stay away from the non-optimal recipe choices (that are located on the undesirable parts of the swing-curve) to avoid possibilities to make overlay measurement error that can be sometimes (depending on the amount of asymmetry and stack) in the order of several "nm". To accurately identify these optimum operating areas of the swing-curve during an experimental setup, one needs to have full-flexibility in wavelength and polarization choices. In this technical publication, a diffraction-based overlay (DBO) measurement tool with many choices of wavelengths and polarizations is utilized on advanced production stacks to study swing-curves. Results show that depending on the stack and the presence of asymmetry, the swing behavior can significantly vary and a solid procedure is needed to identify a recipe during setup that is robust against variations in stack and grating asymmetry. An approach is discussed on how to use this knowledge of swing-curve to identify recipe that is not only accurate at setup, but also robust over the wafer, and wafer-to-wafer. KPIs are reported in run-time to ensure the quality / accuracy of the reading (basically acting as an error bar to overlay measurement).
Atkinson-Palombo, Carol
2010-01-01
Light rail transit (LRT) is increasingly accompanied by overlay zoning which specifies the density and type of future development to encourage landscapes conducive to transit use. Neighbourhood type (based on land use mix) is used to partition data and investigate how pre-existing land use, treatment with a park-and-ride (PAR) versus walk-and-ride (WAR) station and overlay zoning interrelate. Hedonic models estimate capitalisation effects of LRT-related accessibility and overlay zoning on single-family houses and condos in different neighbourhoods for the system in metropolitan Phoenix, Arizona. Impacts differ by housing and neighbourhood type. Amenity-dominated mixed-use neighbourhoods-predominantly WAR communities-experience premiums of 6 per cent for single-family houses and over 20 per cent for condos, the latter boosted an additional 37 per cent by overlay zoning. Residential neighbourhoods-predominantly PAR communities-experience no capitalisation benefits for single-family houses and a discount for condos. The results suggest that land use mix is an important variable to select comparable neighbourhoods.
Hynninen, Ville; Vuori, Leena; Hannula, Markku; Tapio, Kosti; Lahtonen, Kimmo; Isoniemi, Tommi; Lehtonen, Elina; Hirsimäki, Mika; Toppari, J. Jussi; Valden, Mika; Hytönen, Vesa P.
2016-01-01
A straightforward solution-based method to modify the biofunctionality of stainless steel (SS) using heterobifunctional silane-polyethylene glycol (silane-PEG) overlayers is reported. Reduced nonspecific biofouling of both proteins and bacteria onto SS and further selective biofunctionalization of the modified surface were achieved. According to photoelectron spectroscopy analyses, the silane-PEGs formed less than 10 Å thick overlayers with close to 90% surface coverage and reproducible chemical compositions. Consequently, the surfaces also became more hydrophilic, and the observed non-specific biofouling of proteins was reduced by approximately 70%. In addition, the attachment of E. coli was reduced by more than 65%. Moreover, the potential of the overlayer to be further modified was demonstrated by successfully coupling biotinylated alkaline phosphatase (bAP) to a silane-PEG-biotin overlayer via avidin-biotin bridges. The activity of the immobilized enzyme was shown to be well preserved without compromising the achieved antifouling properties. Overall, the simple solution-based approach enables the tailoring of SS to enhance its activity for biomedical and biotechnological applications. PMID:27381834
NASA Astrophysics Data System (ADS)
Hynninen, Ville; Vuori, Leena; Hannula, Markku; Tapio, Kosti; Lahtonen, Kimmo; Isoniemi, Tommi; Lehtonen, Elina; Hirsimäki, Mika; Toppari, J. Jussi; Valden, Mika; Hytönen, Vesa P.
2016-07-01
A straightforward solution-based method to modify the biofunctionality of stainless steel (SS) using heterobifunctional silane-polyethylene glycol (silane-PEG) overlayers is reported. Reduced nonspecific biofouling of both proteins and bacteria onto SS and further selective biofunctionalization of the modified surface were achieved. According to photoelectron spectroscopy analyses, the silane-PEGs formed less than 10 Å thick overlayers with close to 90% surface coverage and reproducible chemical compositions. Consequently, the surfaces also became more hydrophilic, and the observed non-specific biofouling of proteins was reduced by approximately 70%. In addition, the attachment of E. coli was reduced by more than 65%. Moreover, the potential of the overlayer to be further modified was demonstrated by successfully coupling biotinylated alkaline phosphatase (bAP) to a silane-PEG-biotin overlayer via avidin-biotin bridges. The activity of the immobilized enzyme was shown to be well preserved without compromising the achieved antifouling properties. Overall, the simple solution-based approach enables the tailoring of SS to enhance its activity for biomedical and biotechnological applications.
Occlusal force discrimination by denture patients.
Pacer, R J; Bowman, D C
1975-06-01
A study was conducted on subjects with conventional dentures and with overlay dentures to compare their abilities to discriminate between occlusal forces. Perpendicular forces were applied to the dynamic center of the occlusal table of the mandibular denture. Each subject's ability to distinguish differences in values of force was observed and recorded. All subjects with dentures showed sensory threshold values close to those reported for natural teeth. A graphic plotting showed that the responses of subjects with overlay-type dentures were more closely correlated with the psychophysical law as expressed by Stevens as a power function. Since this phenomenon holds true for natural teeth, the overlay denture more closely resembles natural teeth in this type of sensory function than does the conventional denture. In addition to recognized advantages, such as preservation of the ridge and improved retention and stability, the overlay denture provides more typical sensory function than is provided by the conventional denture. This advantage should further motivate dentists and patients to consider the retention and utilization of at least two suitable teeth in an overlay-type denture service.
Recovery of Mo/Si multilayer coated optical substrates
Baker, Sherry L.; Vernon, Stephen P.; Stearns, Daniel G.
1997-12-16
Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO.sub.2 overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.
Recovery of Mo/Si multilayer coated optical substrates
Baker, S.L.; Vernon, S.P.; Stearns, D.G.
1997-12-16
Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO{sub 2} overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates. 5 figs.
High-speed Si/GeSi hetero-structure Electro Absorption Modulator.
Mastronardi, L; Banakar, M; Khokhar, A Z; Hattasan, N; Rutirawut, T; Bucio, T Domínguez; Grabska, K M; Littlejohns, C; Bazin, A; Mashanovich, G; Gardes, F Y
2018-03-19
The ever-increasing demand for integrated, low power interconnect systems is pushing the bandwidth density of CMOS photonic devices. Taking advantage of the strong Franz-Keldysh effect in the C and L communication bands, electro-absorption modulators in Ge and GeSi are setting a new standard in terms of device footprint and power consumption for next generation photonics interconnect arrays. In this paper, we present a compact, low power electro-absorption modulator (EAM) Si/GeSi hetero-structure based on an 800 nm SOI overlayer with a modulation bandwidth of 56 GHz. The device design and fabrication tolerant process are presented, followed by the measurement analysis. Eye diagram measurements show a dynamic ER of 5.2 dB at a data rate of 56 Gb/s at 1566 nm, and calculated modulator power is 44 fJ/bit.
Microeconomics of yield learning and process control in semiconductor manufacturing
NASA Astrophysics Data System (ADS)
Monahan, Kevin M.
2003-06-01
Simple microeconomic models that directly link yield learning to profitability in semiconductor manufacturing have been rare or non-existent. In this work, we review such a model and provide links to inspection capability and cost. Using a small number of input parameters, we explain current yield management practices in 200mm factories. The model is then used to extrapolate requirements for 300mm factories, including the impact of technology transitions to 130nm design rules and below. We show that the dramatic increase in value per wafer at the 300mm transition becomes a driver for increasing metrology and inspection capability and sampling. These analyses correlate well wtih actual factory data and often identify millions of dollars in potential cost savings. We demonstrate this using the example of grating-based overlay metrology for the 65nm node.
WRIS: a resource information system for wildland management
Robert M. Russell; David A. Sharpnack; Elliot Amidon
1975-01-01
WRIS (Wildland Resource Information System) is a computer system for processing, storing, retrieving, updating, and displaying geographic data. The polygon, representing a land area boundary, forms the building block of WRIS. Polygons form a map. Maps are digitized manually or by automatic scanning. Computer programs can extract and produce polygon maps and can overlay...
The use of natural teeth in overlay dentures.
Frantz, W R
1975-08-01
A method has been described for the construction of tooth-supported dentures where the natural tooth was utilized and the acrylic resin for the denture base processed directly to the prepared cast. Based on the 112 dentures that were made, this technique is economical, provides support and stabilization, and has full patient acceptance.
Lopes, António Luís; Botelho, Luís Miguel
2013-01-01
In this paper, we describe a distributed coordination system that allows agents to seamlessly cooperate in problem solving by partially contributing to a problem solution and delegating the subproblems for which they do not have the required skills or knowledge to appropriate agents. The coordination mechanism relies on a dynamically built semantic overlay network that allows the agents to efficiently locate, even in very large unstructured networks, the necessary skills for a specific problem. Each agent performs partial contributions to the problem solution using a new distributed goal-directed version of the Graphplan algorithm. This new goal-directed version of the original Graphplan algorithm provides an efficient solution to the problem of "distraction", which most forward-chaining algorithms suffer from. We also discuss a set of heuristics to be used in the backward-search process of the planning algorithm in order to distribute this process amongst idle agents in an attempt to find a solution in less time. The evaluation results show that our approach is effective in building a scalable and efficient agent society capable of solving complex distributable problems. PMID:23704885
Atomistic minimal model for estimating profile of electrodeposited nanopatterns
NASA Astrophysics Data System (ADS)
Asgharpour Hassankiadeh, Somayeh; Sadeghi, Ali
2018-06-01
We develop a computationally efficient and methodologically simple approach to realize molecular dynamics simulations of electrodeposition. Our minimal model takes into account the nontrivial electric field due a sharp electrode tip to perform simulations of the controllable coating of a thin layer on a surface with an atomic precision. On the atomic scale a highly site-selective electrodeposition of ions and charged particles by means of the sharp tip of a scanning probe microscope is possible. A better understanding of the microscopic process, obtained mainly from atomistic simulations, helps us to enhance the quality of this nanopatterning technique and to make it applicable in fabrication of nanowires and nanocontacts. In the limit of screened inter-particle interactions, it is feasible to run very fast simulations of the electrodeposition process within the framework of the proposed model and thus to investigate how the shape of the overlayer depends on the tip-sample geometry and dielectric properties, electrolyte viscosity, etc. Our calculation results reveal that the sharpness of the profile of a nano-scale deposited overlayer is dictated by the normal-to-sample surface component of the electric field underneath the tip.
Virtual fixtures as tools to enhance operator performance in telepresence environments
NASA Astrophysics Data System (ADS)
Rosenberg, Louis B.
1993-12-01
This paper introduces the notion of virtual fixtures for use in telepresence systems and presents an empirical study which demonstrates that such virtual fixtures can greatly enhance operator performance within remote environments. Just as tools and fixtures in the real world can enhance human performance by guiding manual operations, providing localizing references, and reducing the mental processing required to perform a task, virtual fixtures are computer generated percepts overlaid on top of the reflection of a remote workspace which can provide similar benefits. Like a ruler guiding a pencil in a real manipulation task, a virtual fixture overlaid on top of a remote workspace can act to reduce the mental processing required to perform a task, limit the workload of certain sensory modalities, and most of all allow precision and performance to exceed natural human abilities. Because such perceptual overlays are virtual constructions they can be diverse in modality, abstract in form, and custom tailored to individual task or user needs. This study investigates the potential of virtual fixtures by implementing simple combinations of haptic and auditory sensations as perceptual overlays during a standardized telemanipulation task.
ATLAS Simulation using Real Data: Embedding and Overlay
NASA Astrophysics Data System (ADS)
Haas, Andrew; ATLAS Collaboration
2017-10-01
For some physics processes studied with the ATLAS detector, a more accurate simulation in some respects can be achieved by including real data into simulated events, with substantial potential improvements in the CPU, disk space, and memory usage of the standard simulation configuration, at the cost of significant database and networking challenges. Real proton-proton background events can be overlaid (at the detector digitization output stage) on a simulated hard-scatter process, to account for pileup background (from nearby bunch crossings), cavern background, and detector noise. A similar method is used to account for the large underlying event from heavy ion collisions, rather than directly simulating the full collision. Embedding replaces the muons found in Z→μμ decays in data with simulated taus at the same 4-momenta, thus preserving the underlying event and pileup from the original data event. In all these cases, care must be taken to exactly match detector conditions (beamspot, magnetic fields, alignments, dead sensors, etc.) between the real data event and the simulation. We will discuss the status of these overlay and embedding techniques within ATLAS software and computing.
Characterizing the Global Impact of P2P Overlays on the AS-Level Underlay
NASA Astrophysics Data System (ADS)
Rasti, Amir Hassan; Rejaie, Reza; Willinger, Walter
This paper examines the problem of characterizing and assessing the global impact of the load imposed by a Peer-to-Peer (P2P) overlay on the AS-level underlay. In particular, we capture Gnutella snapshots for four consecutive years, obtain the corresponding AS-level topology snapshots of the Internet and infer the AS-paths associated with each overlay connection. Assuming a simple model of overlay traffic, we analyze the observed load imposed by these Gnutella snapshots on the AS-level underlay using metrics that characterize the load seen on individual AS-paths and by the transit ASes, illustrate the churn among the top transit ASes during this 4-year period, and describe the propagation of traffic within the AS-level hierarchy.
Roll Casting of Aluminum Alloy Clad Strip
DOE Office of Scientific and Technical Information (OSTI.GOV)
Nakamura, R.; Tsuge, H.; Haga, T.
2011-01-17
Casting of aluminum alloy three layers of clad strip was tried using the two sets of twin roll casters, and effects of the casting parameters on the cladding conditions were investigated. One twin roll caster was mounted on the other twin roll caster. Base strip was 8079 aluminum alloy and overlay strips were 6022 aluminum alloy. Effects of roll-load of upper and lower casters and melt temperature of the lower caster were investigated. When the roll-load of the upper and lower caster was large enough, the overlay strip could be solidified and be connected. The overlay strip could be connectedmore » when the melt of the overlay strip cast by the lower caster was low enough. Sound three layers of clad strip could be cast by proper conditions.« less
Light emitting ceramic device and method for fabricating the same
Valentine, Paul; Edwards, Doreen D.; Walker Jr., William John; Slack, Lyle H.; Brown, Wayne Douglas; Osborne, Cathy; Norton, Michael; Begley, Richard
2004-11-30
A light-emitting ceramic based panel, hereafter termed "electroceramescent" panel, and alternative methods of fabrication for the same are claimed. The electroceramescent panel is formed on a substrate providing mechanical support as well as serving as the base electrode for the device. One or more semiconductive ceramic layers directly overlay the substrate, and electrical conductivity and ionic diffusion are controlled. Light emitting regions overlay the semiconductive ceramic layers, and said regions consist sequentially of a layer of a ceramic insulation layer and an electroluminescent layer, comprised of doped phosphors or the equivalent. One or more conductive top electrode layers having optically transmissive areas overlay the light emitting regions, and a multi-layered top barrier cover comprising one or more optically transmissive non-combustible insulation layers overlay said top electrode regions.
Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing.
NASA Astrophysics Data System (ADS)
Benschop, Jos; Engelen, Andre; Cramer, Hugo; Kubis, Michael; Hinnen, Paul; van der Laan, Hans; Bhattacharyya, Kaustuve; Mulkens, Jan
2013-04-01
The overlay, CDU and focus requirements for the 20nm node can only be met using a holistic lithography approach whereby full use is made of high-order, field-by-field, scanner correction capabilities. An essential element in this approach is a fast, precise and accurate in-line metrology sensor, capable to measure on product. The capabilities of the metrology sensor as well as the impact on overlay, CD and focus will be shared in this paper.
In-situ formation of multiphase air plasma sprayed barrier coatings for turbine components
Subramanian, Ramesh
2001-01-01
A turbine component (10), such as a turbine blade, is provided which is made of a metal alloy (22) and a base, planar-grained thermal barrier layer (28) applied by air plasma spraying on the alloy surface, where a heat resistant ceramic oxide overlay material (32') covers the bottom thermal barrier coating (28), and the overlay material is the reaction product of the precursor ceramic oxide overlay material (32) and the base thermal barrier coating material (28).
Hultman, Charles Scott; Clayton, John L; Kittinger, Benjamin J; Tong, Winnie M
2014-01-01
Learning curves are characterized by incremental improvement of a process, through repetition and reduction in variability, but can be disrupted with the emergence of new techniques and technologies. Abdominal wall reconstruction continues to evolve, with the introduction of components separation in the 1990s and biologic mesh in the 2000s. As such, attempts at innovation may impact the success of reconstructive outcomes and yield a changing set of complications. The purpose of this project was to describe the paradigm shift that has occurred in abdominal wall reconstruction during the past 10 years, focusing on the incorporation of new materials and methods. We reviewed 150 consecutive patients who underwent abdominal wall reconstruction of midline defects with components separation, from 2000 to 2010. Both univariate and multivariate logistic regression analyses were performed to identify risk factors for complications. Patients were stratified into the following periods: early (2000-2003), middle (2004-2006), and late (2007-2010). From 2000 to 2010, we performed 150 abdominal wall reconstructions with components separation [mean age, 50.2 years; body mass index (BMI), 30.4; size of defect, 357 cm; length of stay, 9.6 days; follow-up, 4.4 years]. Primary fascial closure was performed in 120 patients. Mesh was used in 114 patients in the following locations: overlay (n = 28), inlay (n = 30), underlay (n = 54), and unknown (n = 2). Complications occurred in a bimodal distribution, highest in 2001 (introduction of biologic mesh) and 2008 (conversion from underlay to overlay location). Age, sex, history of smoking, defect size, and length of stay were not associated with incidence of complications. Unadjusted risk factors for seroma (16.8%) were elevated BMI, of previous hernia repairs, use of overlay mesh, and late portion of the learning curve, with logistic regression supporting only late portion of the learning curve [odds ratio (OR), 4.3; 95% confidence interval (CI), 1.0-18.6] and BMI (OR, 1.17; 95% CI, 1.06-1.29). The only unadjusted risk factor for recurrence was location of mesh. Logistic regression, comparing underlay, inlay, and overlay mesh to no mesh, revealed that the use of underlay mesh predicted recurrence (OR, 3.0; 95% CI, 1.04-8.64). All P values were less than 0.05. The overall learning curve for a specific procedure, such as abdominal wall reconstruction, can be quite volatile, especially as innovative techniques and new technologies are introduced and incorporated into the surgeon's practice. Our current practice includes primary repair myofascial flap of the components separation and the use of biologic mesh as an overlay graft, anchored to the external oblique. This process of outcome improvement is not gradual but is often punctuated by periods of failure and redemption.
DOT National Transportation Integrated Search
2013-04-01
The objective of this subtask was to generate crack resistant hot mix designs which could be placed very thin using locally available materials for each of the West Texas Districts wanting to participate in this study. Crack Attenuating Mixes (CAMs) ...
Thin Bonded Concrete Overlay and Bonding Agents
DOT National Transportation Integrated Search
1996-06-01
This report presents the construction procedures and initial performance evaluation of a four-inch Bonded Concrete Overlay placed on Interstate 80 near Moline, Illinois. Preconstruction testing consisted of Falling Weight Deflectometer, permeability ...
Improving concrete overlay construction.
DOT National Transportation Integrated Search
2010-03-01
Several road construction projects involving concrete overlays at the state and county levels in Iowa in 2009 were studied for : construction techniques and methods. The projects that were evaluated consisted of sites in four Iowa counties: Osceola, ...
Longer Lasting Bridge Deck Overlays
DOT National Transportation Integrated Search
2018-04-01
The objective of this report is to determine the most effective method for bridge deck overlay construction and repair by assessing current practices; examining new products and technologies; and reviewing NCHRP (National Cooperative Highway Research...
NASA Astrophysics Data System (ADS)
Haring, Martijn T.; Liv, Nalan; Zonnevylle, A. Christiaan; Narvaez, Angela C.; Voortman, Lenard M.; Kruit, Pieter; Hoogenboom, Jacob P.
2017-03-01
In the biological sciences, data from fluorescence and electron microscopy is correlated to allow fluorescence biomolecule identification within the cellular ultrastructure and/or ultrastructural analysis following live-cell imaging. High-accuracy (sub-100 nm) image overlay requires the addition of fiducial markers, which makes overlay accuracy dependent on the number of fiducials present in the region of interest. Here, we report an automated method for light-electron image overlay at high accuracy, i.e. below 5 nm. Our method relies on direct visualization of the electron beam position in the fluorescence detection channel using cathodoluminescence pointers. We show that image overlay using cathodoluminescence pointers corrects for image distortions, is independent of user interpretation, and does not require fiducials, allowing image correlation with molecular precision anywhere on a sample.
Haring, Martijn T; Liv, Nalan; Zonnevylle, A Christiaan; Narvaez, Angela C; Voortman, Lenard M; Kruit, Pieter; Hoogenboom, Jacob P
2017-03-02
In the biological sciences, data from fluorescence and electron microscopy is correlated to allow fluorescence biomolecule identification within the cellular ultrastructure and/or ultrastructural analysis following live-cell imaging. High-accuracy (sub-100 nm) image overlay requires the addition of fiducial markers, which makes overlay accuracy dependent on the number of fiducials present in the region of interest. Here, we report an automated method for light-electron image overlay at high accuracy, i.e. below 5 nm. Our method relies on direct visualization of the electron beam position in the fluorescence detection channel using cathodoluminescence pointers. We show that image overlay using cathodoluminescence pointers corrects for image distortions, is independent of user interpretation, and does not require fiducials, allowing image correlation with molecular precision anywhere on a sample.
Haring, Martijn T.; Liv, Nalan; Zonnevylle, A. Christiaan; Narvaez, Angela C.; Voortman, Lenard M.; Kruit, Pieter; Hoogenboom, Jacob P.
2017-01-01
In the biological sciences, data from fluorescence and electron microscopy is correlated to allow fluorescence biomolecule identification within the cellular ultrastructure and/or ultrastructural analysis following live-cell imaging. High-accuracy (sub-100 nm) image overlay requires the addition of fiducial markers, which makes overlay accuracy dependent on the number of fiducials present in the region of interest. Here, we report an automated method for light-electron image overlay at high accuracy, i.e. below 5 nm. Our method relies on direct visualization of the electron beam position in the fluorescence detection channel using cathodoluminescence pointers. We show that image overlay using cathodoluminescence pointers corrects for image distortions, is independent of user interpretation, and does not require fiducials, allowing image correlation with molecular precision anywhere on a sample. PMID:28252673
Residual stress determination in an overlay dissimilar welded pipe by neutron diffraction
DOE Office of Scientific and Technical Information (OSTI.GOV)
Woo, Wan Chuck; Em, Vyacheslav; Hubbard, Camden R
2011-01-01
Residual stresses were determined through the thickness of a dissimilar weld overlay pipe using neutron diffraction. The specimen has a complex joining structure consisting of a ferritic steel (SA508), austenitic steel (F316L), Ni-based consumable (Alloy 182), and overlay of Ni-base superalloy (Alloy 52M). It simulates pressurized nozzle components, which have been a critical issue under the severe crack condition of nuclear power reactors. Two neutron diffractometers with different spatial resolutions have been utilized on the identical specimen for comparison. The macroscopic 'stress-free' lattice spacing (d{sub o}) was also obtained from both using a 2-mm width comb-like coupon. The results showmore » significant changes in residual stresses from tension (300-400 MPa) to compression (-600 MPa) through the thickness of the dissimilar weld overlay pipe specimen.« less
Secret Forwarding of Events over Distributed Publish/Subscribe Overlay Network.
Yoon, Young; Kim, Beom Heyn
2016-01-01
Publish/subscribe is a communication paradigm where loosely-coupled clients communicate in an asynchronous fashion. Publish/subscribe supports the flexible development of large-scale, event-driven and ubiquitous systems. Publish/subscribe is prevalent in a number of application domains such as social networking, distributed business processes and real-time mission-critical systems. Many publish/subscribe applications are sensitive to message loss and violation of privacy. To overcome such issues, we propose a novel method of using secret sharing and replication techniques. This is to reliably and confidentially deliver decryption keys along with encrypted publications even under the presence of several Byzantine brokers across publish/subscribe overlay networks. We also propose a framework for dynamically and strategically allocating broker replicas based on flexibly definable criteria for reliability and performance. Moreover, a thorough evaluation is done through a case study on social networks using the real trace of interactions among Facebook users.
Secret Forwarding of Events over Distributed Publish/Subscribe Overlay Network
Kim, Beom Heyn
2016-01-01
Publish/subscribe is a communication paradigm where loosely-coupled clients communicate in an asynchronous fashion. Publish/subscribe supports the flexible development of large-scale, event-driven and ubiquitous systems. Publish/subscribe is prevalent in a number of application domains such as social networking, distributed business processes and real-time mission-critical systems. Many publish/subscribe applications are sensitive to message loss and violation of privacy. To overcome such issues, we propose a novel method of using secret sharing and replication techniques. This is to reliably and confidentially deliver decryption keys along with encrypted publications even under the presence of several Byzantine brokers across publish/subscribe overlay networks. We also propose a framework for dynamically and strategically allocating broker replicas based on flexibly definable criteria for reliability and performance. Moreover, a thorough evaluation is done through a case study on social networks using the real trace of interactions among Facebook users. PMID:27367610
NASA Astrophysics Data System (ADS)
Varma, Shikha
We have studied thin (1-7 monolayer) overlayers of Hg on Ag(100) and Cu(100) using angle-resolved photoemission and low energy electron diffraction. We have investigated the electronic states of well ordered, disordered and the liquid overlayers of mercury. We show that the electronic structure of the well ordered overlayers is very different than that of the disordered and the liquid overlayers. The well ordered overlayers of Hg on Ag(100) exhibit a new electronic state which is absent for the disordered overlayers of mercury as well as for gaseous mercury. We will argue that this new Hg state is a result of the interaction among the Hg-Hg atoms, when adsorbed on Ag(100). The strain among adlayer atoms also plays a crucial role in the development of the new electronic state. We have used the synchrotron radiation to study the partial cross-section and the branching ratio of the 5d electronic state of Hg. We have measured the partial cross-section and branching ratio of the well-ordered, disordered and liquid overlayers of mercury on Ag(100) and Cu(100). We have observed resonances in the photoemission intensities of the mercury 5d orbitals for thin films of mercury for incident photon energies near the 5p _{3/2}, 4f_{7/2 } and 4f_{5/2} thresholds. The results indicate that interband transitions from the 5p and 4f levels to the 5d orbitals can occur for a thin overlayer of mercury, as a result of final state 5f contributions, though such interband transitions are forbidden for the free isolated Hg atom. These resonances are attributed to the formation of a solid state band structure incorporating new itinerant mercury electronic state. These resonances are absent when the mercury film is disordered or melted. We have measured the branching ratio of the 5d orbital for thin mercury overlayers in the photon energy range between 26 to 105 eV. The branching ratios deviate from the nonrelativistic statistical value of 1.5, reaching values of 8.0. These results indicate the importance of long range crystallographic structure and the effect of many -electron interactions in a thin film of mercury. We have also studied the intra molecular excitations in Br_2 and I_2 molecules using electron energy loss studies. These excitations give the information about the electronic structure of the molecule. From these studies we have identified the separation between the occupied and unoccupied orbitals of adsorbed halogen molecules on Fe(100).
A clinical pilot study of a modular video-CT augmentation system for image-guided skull base surgery
NASA Astrophysics Data System (ADS)
Liu, Wen P.; Mirota, Daniel J.; Uneri, Ali; Otake, Yoshito; Hager, Gregory; Reh, Douglas D.; Ishii, Masaru; Gallia, Gary L.; Siewerdsen, Jeffrey H.
2012-02-01
Augmentation of endoscopic video with preoperative or intraoperative image data [e.g., planning data and/or anatomical segmentations defined in computed tomography (CT) and magnetic resonance (MR)], can improve navigation, spatial orientation, confidence, and tissue resection in skull base surgery, especially with respect to critical neurovascular structures that may be difficult to visualize in the video scene. This paper presents the engineering and evaluation of a video augmentation system for endoscopic skull base surgery translated to use in a clinical study. Extension of previous research yielded a practical system with a modular design that can be applied to other endoscopic surgeries, including orthopedic, abdominal, and thoracic procedures. A clinical pilot study is underway to assess feasibility and benefit to surgical performance by overlaying CT or MR planning data in realtime, high-definition endoscopic video. Preoperative planning included segmentation of the carotid arteries, optic nerves, and surgical target volume (e.g., tumor). An automated camera calibration process was developed that demonstrates mean re-projection accuracy (0.7+/-0.3) pixels and mean target registration error of (2.3+/-1.5) mm. An IRB-approved clinical study involving fifteen patients undergoing skull base tumor surgery is underway in which each surgery includes the experimental video-CT system deployed in parallel to the standard-of-care (unaugmented) video display. Questionnaires distributed to one neurosurgeon and two otolaryngologists are used to assess primary outcome measures regarding the benefit to surgical confidence in localizing critical structures and targets by means of video overlay during surgical approach, resection, and reconstruction.
Large-Scale Overlays and Trends: Visually Mining, Panning and Zooming the Observable Universe.
Luciani, Timothy Basil; Cherinka, Brian; Oliphant, Daniel; Myers, Sean; Wood-Vasey, W Michael; Labrinidis, Alexandros; Marai, G Elisabeta
2014-07-01
We introduce a web-based computing infrastructure to assist the visual integration, mining and interactive navigation of large-scale astronomy observations. Following an analysis of the application domain, we design a client-server architecture to fetch distributed image data and to partition local data into a spatial index structure that allows prefix-matching of spatial objects. In conjunction with hardware-accelerated pixel-based overlays and an online cross-registration pipeline, this approach allows the fetching, displaying, panning and zooming of gigabit panoramas of the sky in real time. To further facilitate the integration and mining of spatial and non-spatial data, we introduce interactive trend images-compact visual representations for identifying outlier objects and for studying trends within large collections of spatial objects of a given class. In a demonstration, images from three sky surveys (SDSS, FIRST and simulated LSST results) are cross-registered and integrated as overlays, allowing cross-spectrum analysis of astronomy observations. Trend images are interactively generated from catalog data and used to visually mine astronomy observations of similar type. The front-end of the infrastructure uses the web technologies WebGL and HTML5 to enable cross-platform, web-based functionality. Our approach attains interactive rendering framerates; its power and flexibility enables it to serve the needs of the astronomy community. Evaluation on three case studies, as well as feedback from domain experts emphasize the benefits of this visual approach to the observational astronomy field; and its potential benefits to large scale geospatial visualization in general.
An MR-based Model for Cardio-Respiratory Motion Compensation of Overlays in X-Ray Fluoroscopy
Fischer, Peter; Faranesh, Anthony; Pohl, Thomas; Maier, Andreas; Rogers, Toby; Ratnayaka, Kanishka; Lederman, Robert; Hornegger, Joachim
2017-01-01
In X-ray fluoroscopy, static overlays are used to visualize soft tissue. We propose a system for cardiac and respiratory motion compensation of these overlays. It consists of a 3-D motion model created from real-time MR imaging. Multiple sagittal slices are acquired and retrospectively stacked to consistent 3-D volumes. Slice stacking considers cardiac information derived from the ECG and respiratory information extracted from the images. Additionally, temporal smoothness of the stacking is enhanced. Motion is estimated from the MR volumes using deformable 3-D/3-D registration. The motion model itself is a linear direct correspondence model using the same surrogate signals as slice stacking. In X-ray fluoroscopy, only the surrogate signals need to be extracted to apply the motion model and animate the overlay in real time. For evaluation, points are manually annotated in oblique MR slices and in contrast-enhanced X-ray images. The 2-D Euclidean distance of these points is reduced from 3.85 mm to 2.75 mm in MR and from 3.0 mm to 1.8 mm in X-ray compared to the static baseline. Furthermore, the motion-compensated overlays are shown qualitatively as images and videos. PMID:28692969
"Performance Of A Wafer Stepper With Automatic Intra-Die Registration Correction."
NASA Astrophysics Data System (ADS)
van den Brink, M. A.; Wittekoek, S.; Linders, H. F. D.; van Hout, F. J.; George, R. A.
1987-01-01
An evaluation of a wafer stepper with the new improved Philips/ASM-L phase grating alignment system is reported. It is shown that an accurate alignment system needs an accurate X-Y-0 wafer stage and an accurate reticle Z stage to realize optimum overlay accuracy. This follows from a discussion of the overlay budget and an alignment procedure model. The accurate wafer stage permits high overlay accuracy using global alignment only, thus eliminating the throughput penalty of align-by-field schemes. The accurate reticle Z stage enables an intra-die magnification control with respect to the wafer scale. Various overlay data are reported, which have been measured with the automatic metrology program of the stepper. It is demonstrated that the new dual alignment system (with the external spatial filter) has improved the ability to align to weakly reflecting layers. The results are supported by a Fourier analysis of the alignment signal. Resolution data are given for the PAS 2500 projection lenses, which show that the high overlay accuracy of the system is properly matched with submicron linewidth control. The results of a recently introduced 20mm i-line lens with a numerical aperture of 0.4 (Zeiss 10-78-58) are included.
Optical resonance analysis of reflected long period fiber gratings with metal film overlay
NASA Astrophysics Data System (ADS)
Zhang, Guiju; Cao, Bing; Wang, Chinua; Zhao, Minfu
2008-11-01
We present the experimental results of a novel single-ended reflecting surface plasma resonance (SPR) based long period fiber grating (LPFG) sensor. A long period fiber grating sensing device is properly designed and fabricated with a pulsed CO2 laser writing system. Different nm-thick thin metal films are deposited on the fiber cladding and the fiber end facet for the excitation of surface plasma waves (SPWs) and the reflection of the transmission spectrum of the LPFG with doubled interaction between metal-dielectric interfaces of the fiber to enhance the SPW of the all-fiber SPR-LPFG sensing system. Different thin metal films with different thicknesses are investigated. The effect of the excited SPW transmission along the fiber cladding-metal interface with silver and aluminum films is observed. It is found that different thicknesses of the metal overlay show different resonant behaviors in terms of resonance peak situation, bandwidth and energy loss. Within a certain range, thinner metal film shows narrower bandwidth and deeper peak loss.
NASA Astrophysics Data System (ADS)
Shimazaki, Kazunori; Kawakita, Shirou; Imaizumi, Mitsuru; Kuwajima, Saburou; Sakurai, Keiichiro; Matsubara, Koji; Niki, Sigeru
2005-05-01
Optical coating on Cu(In, Ga)Se2 thin film solar cells, which have high radiation tolerance, is investigated in order to improve their radiative properties for thermal balance in space. Due to low thermal emissivity, the temperature of the CIGS solar cell is expected to exceed the allowable limit if no coating is applied. Evaporated single-layer coating of silicon dioxide and additional over-layer coatings on the CIGS solar cells increase the emissivity from 0.18 to 0.75. The coating with the over-layer coatings realizes higher emissivity with less thickness than that of the single SiO2 coating. In addition, optical coatings reflecting UV rays and infrared radiation are designed and evaporated on the cells to control solar input. The developed optical coatings could give the CIGS solar cells appropriate thermal radiative properties for space applications without any degradations of the cell performance.
Latex-modified concrete overlay containing Type K cement.
DOT National Transportation Integrated Search
2005-01-01
Hydraulic cement concrete overlays are usually placed on bridges to reduce the infiltration of water and chloride ions and to improve skid resistance, ride quality, and surface appearance. Constructed in accordance with prescription specifications, s...
Utilizing Lab Tests to Predict Asphalt Concrete Overlay Performance
DOT National Transportation Integrated Search
2017-12-01
A series of five experimental projects and three demonstration projects were constructed to better understand the performance of pavement overlays using various levels of asphalt binder replacement (ABR) from reclaimed asphalt pavement (RAP), recycle...
Evaluation of E-Krete for rut filling.
DOT National Transportation Integrated Search
2003-03-01
Wheel path rutting in asphalt pavements presents a serious problem for highway agencies : worldwide. There are several ways to rehabilitate rutted asphalt pavements, including milling by : itself, milling and overlay, overlay without milling, and rut...
Effectiveness of two reflection crack attenuation techniques.
DOT National Transportation Integrated Search
2015-09-01
Asphalt overlays are one of the most common tools for rehabilitating existing asphalt and concrete pavements. : However, the performance of new overlays is often jeopardized by the cracking distress in the existing : pavement. This existing cracking ...
Measuring, Achieving, And Promoting Smoothness Of Virginia's Asphalt Overlays
DOT National Transportation Integrated Search
1999-04-01
This study was initiated with the goal of identifying the predominant factors affecting the achievable smoothness of asphalt overlays. In addition, the researcher chronicles the evolution of Virginia's innovative special provision for smoothness, whi...
Working group organizational meeting
NASA Technical Reports Server (NTRS)
1982-01-01
Scene radiation and atmospheric effects, mathematical pattern recognition and image analysis, information evaluation and utilization, and electromagnetic measurements and signal handling are considered. Research issues in sensors and signals, including radar (SAR) reflectometry, SAR processing speed, registration, including overlay of SAR and optical imagery, entire system radiance calibration, and lack of requirements for both sensors and systems, etc. were discussed.
Improving Scores on Computerized Reading Assessments: The Effects of Colored Overlay Use
ERIC Educational Resources Information Center
Adams, Tracy A.
2012-01-01
Visual stress is a perceptual dysfunction that appears to affect how information is processed as it passes from the eyes to the brain. Photophobia, visual resolution, restricted focus, sustaining focus, and depth perception are all components of visual stress. Because visual stress affects what is perceived by the eye, students with this disorder…
Stability and imaging of the ASML EUV alpha demo tool
NASA Astrophysics Data System (ADS)
Hermans, Jan V.; Baudemprez, Bart; Lorusso, Gian; Hendrickx, Eric; van Dijk, Andre; Jonckheere, Rik; Goethals, Anne-Marie
2009-03-01
Extreme Ultra-Violet (EUV) lithography is the leading candidate for semiconductor manufacturing of the 22nm technology node and beyond, due to the very short wavelength of 13.5nm. However, reducing the wavelength adds complexity to the lithographic process. The impact of the EUV specific conditions on lithographic performance needs to be understood, before bringing EUV lithography into pre-production. To provide early learning on EUV, an EUV fullfield scanner, the Alpha Demo Tool (ADT) from ASML was installed at IMEC, using a Numerical Aperture (NA) of 0.25. In this paper we report on different aspects of the ADT: the imaging and overlay performance and both short and long-term stability. For 40nm dense Lines-Spaces (LS), the ADT shows an across field overlapping process window of 270nm Depth Of Focus (DOF) at 10% Exposure Latitude (EL) and a wafer CD Uniformity (CDU) of 3nm 3σ, without any corrections for process or reticle. The wafer CDU is correlated to different factors that are known to influence the CD fingerprint from traditional lithography: slit intensity uniformity, focus plane deviation and reticle CD error. Taking these contributions into account, the CD through slit fingerprint for 40nm LS is simulated with excellent agreement to experimental data. The ADT shows good CD stability over 9 months of operation, both intrafield and across wafer. The projection optics reflectivity has not degraded over 9 months. Measured overlay performance with respect to a dry tool shows |Mean|+3σ below 20nm with more correction potential by applying field-by-field corrections (|Mean|+3σ <=10nm). For 22nm SRAM application, both contact hole and metal layer were printed in EUV with 10% CD and 15nm overlay control. Below 40nm, the ADT shows good wafer CDU for 30nm dense and isolated lines (on the same wafer) and 38nm dense Contact Holes (CH). First 28nm dense line CDU data are achieved. The results indicate that the ADT can be used effectively for EUV process development before installation of the pre-production tool, the ASML NXE Gen. 1 at IMEC.
Sally Ride EarthKAM - Automated Image Geo-Referencing Using Google Earth Web Plug-In
NASA Technical Reports Server (NTRS)
Andres, Paul M.; Lazar, Dennis K.; Thames, Robert Q.
2013-01-01
Sally Ride EarthKAM is an educational program funded by NASA that aims to provide the public the ability to picture Earth from the perspective of the International Space Station (ISS). A computer-controlled camera is mounted on the ISS in a nadir-pointing window; however, timing limitations in the system cause inaccurate positional metadata. Manually correcting images within an orbit allows the positional metadata to be improved using mathematical regressions. The manual correction process is time-consuming and thus, unfeasible for a large number of images. The standard Google Earth program allows for the importing of KML (keyhole markup language) files that previously were created. These KML file-based overlays could then be manually manipulated as image overlays, saved, and then uploaded to the project server where they are parsed and the metadata in the database is updated. The new interface eliminates the need to save, download, open, re-save, and upload the KML files. Everything is processed on the Web, and all manipulations go directly into the database. Administrators also have the control to discard any single correction that was made and validate a correction. This program streamlines a process that previously required several critical steps and was probably too complex for the average user to complete successfully. The new process is theoretically simple enough for members of the public to make use of and contribute to the success of the Sally Ride EarthKAM project. Using the Google Earth Web plug-in, EarthKAM images, and associated metadata, this software allows users to interactively manipulate an EarthKAM image overlay, and update and improve the associated metadata. The Web interface uses the Google Earth JavaScript API along with PHP-PostgreSQL to present the user the same interface capabilities without leaving the Web. The simpler graphical user interface will allow the public to participate directly and meaningfully with EarthKAM. The use of similar techniques is being investigated to place ground-based observations in a Google Mars environment, allowing the MSL (Mars Science Laboratory) Science Team a means to visualize the rover and its environment.
NASA Technical Reports Server (NTRS)
Winter, O. A.
1980-01-01
The B01 version of the United Subsonic Supersonic Aerodynamic Analysis program is the result of numerous modifications and additions made to the B00 version. These modifications and additions affect the program input, its computational options, the code readability, and the overlay structure. The following are described: (1) the revised input; (2) the plotting overlay programs which were also modified, and their associated subroutines, (3) the auxillary files used by the program, the revised output data; and (4) the program overlay structure.
Interacting epidemics on overlay networks
NASA Astrophysics Data System (ADS)
Funk, Sebastian; Jansen, Vincent A. A.
2010-03-01
The interaction between multiple pathogens spreading on networks connecting a given set of nodes presents an ongoing theoretical challenge. Here, we aim to understand such interactions by studying bond percolation of two different processes on overlay networks of arbitrary joint degree distribution. We find that an outbreak of a first pathogen providing immunity to another one spreading subsequently on a second network connecting the same set of nodes does so most effectively if the degrees on the two networks are positively correlated. In that case, the protection is stronger the more heterogeneous the degree distributions of the two networks are. If, on the other hand, the degrees are uncorrelated or negatively correlated, increasing heterogeneity reduces the potential of the first process to prevent the second one from reaching epidemic proportions. We generalize these results to cases where the edges of the two networks overlap to arbitrary amount, or where the immunity granted is only partial. If both processes grant immunity to each other, we find a wide range of possible situations of coexistence or mutual exclusion, depending on the joint degree distribution of the underlying networks and the amount of immunity granted mutually. These results generalize the concept of a coexistence threshold and illustrate the impact of large-scale network structure on the interaction between multiple spreading agents.
WRC bulletin. A review of underclad cracking in pressure-vessel components
DOE Office of Scientific and Technical Information (OSTI.GOV)
Vinckier, A.G.; Pense, A.W.
1974-01-01
This review of cracking underneath the weld cladding is to determine what factors contribute to this condition, and to outline means for alleviating or eliminating this condition. Considerable data on manufacture, heat treatment, and cladding of heavy-section pressure-vessel steels for nuclear service are also included. Three factors in combination that promote underclad cracking are susceptible microstructure, favorable residual-stress pattern, and a thermal treatment bringing the steel into a critical temperature region (600-650/sup 0/C) where creep ductility is low. High-heat-input weld-overlay cladding produces the susceptible microstructure and residual-stress pattern and postweld heat treatment produces the critical temperature. Most underclad cracking wasmore » found in SA508 Class 2 steel forgings clad with one-layer submerged-arc strip electrodes or multi-electrode processes. It was not produced in SA533 Grade B plate or when multilayer overlay processes were used. Underclad cracking can be reduced or eliminated by a two-layer cladding technique, by controlling welding process variables (low heat input), renormalizing the sensitive HAZ region prior to heat treatment, by use of nonsusceptible materials, or by eliminating the postweld heat treatment. Results of a questionnaire survey are also included. 50 references. (DLC)« less
Does Gender Influence Colour Choice in the Treatment of Visual Stress?
Conway, Miriam L.; Evans, Bruce J. W.; Evans, Josephine C.; Suttle, Catherine M.
2016-01-01
Purpose Visual Stress (VS) is a condition in which words appear blurred, in motion, or otherwise distorted when reading. Some people diagnosed with VS find that viewing black text on white paper through coloured overlays or precision tinted lenses (PTLs) reduces symptoms attributed to VS. The aim of the present study is to determine whether the choice of colour of overlays or PTLs is influenced by a patient’s gender. Methods Records of all patients attending a VS assessment in two optometry practices between 2009 and 2014 were reviewed retrospectively. Patients who reported a significant and consistent reduction in symptoms with either overlay and or PTL were included in the analysis. Overlays and PTLs were categorized as stereotypical male, female or neutral colours based on gender preferences as described in the literature. Chi-square analysis was carried out to determine whether gender (across all ages or within age groups) was associated with overlay or PTL colour choice. Results 279 patients (133 males and 146 females, mean age 17 years) consistently showed a reduction in symptoms with an overlay and were included. Chi-square analysis revealed no significant association between the colour of overlay chosen and male or female gender (Chi-square 0.788, p = 0.674). 244 patients (120 males and 124 females, mean age 24.5 years) consistently showed a reduction in symptoms with PTLs and were included. Chi-square analysis revealed a significant association between stereotypical male/female/neutral colours of PTLs chosen and male/female gender (Chi-square 6.46, p = 0.040). More males preferred stereotypical male colour PTLs including blue and green while more females preferred stereotypical female colour PTLs including pink and purple. Conclusions For some VS patients, the choice of PTL colour is influenced not only by the alleviation of symptoms but also by other non-visual factors such as gender. PMID:27648842
Does Gender Influence Colour Choice in the Treatment of Visual Stress?
Conway, Miriam L; Evans, Bruce J W; Evans, Josephine C; Suttle, Catherine M
2016-01-01
Visual Stress (VS) is a condition in which words appear blurred, in motion, or otherwise distorted when reading. Some people diagnosed with VS find that viewing black text on white paper through coloured overlays or precision tinted lenses (PTLs) reduces symptoms attributed to VS. The aim of the present study is to determine whether the choice of colour of overlays or PTLs is influenced by a patient's gender. Records of all patients attending a VS assessment in two optometry practices between 2009 and 2014 were reviewed retrospectively. Patients who reported a significant and consistent reduction in symptoms with either overlay and or PTL were included in the analysis. Overlays and PTLs were categorized as stereotypical male, female or neutral colours based on gender preferences as described in the literature. Chi-square analysis was carried out to determine whether gender (across all ages or within age groups) was associated with overlay or PTL colour choice. 279 patients (133 males and 146 females, mean age 17 years) consistently showed a reduction in symptoms with an overlay and were included. Chi-square analysis revealed no significant association between the colour of overlay chosen and male or female gender (Chi-square 0.788, p = 0.674). 244 patients (120 males and 124 females, mean age 24.5 years) consistently showed a reduction in symptoms with PTLs and were included. Chi-square analysis revealed a significant association between stereotypical male/female/neutral colours of PTLs chosen and male/female gender (Chi-square 6.46, p = 0.040). More males preferred stereotypical male colour PTLs including blue and green while more females preferred stereotypical female colour PTLs including pink and purple. For some VS patients, the choice of PTL colour is influenced not only by the alleviation of symptoms but also by other non-visual factors such as gender.
NASA Technical Reports Server (NTRS)
Barrett, Joe H., III; Lafosse, Richard; Hood, Doris; Hoeth, Brian
2007-01-01
Graphical overlays can be created in real-time in the Advanced Weather Interactive Processing System (AWIPS) using shapefiles or Denver AWIPS Risk Reduction and Requirements Evaluation (DARE) Graphics Metafile (DGM) files. This presentation describes how to create graphical overlays on-the-fly for AWIPS, by using two examples of AWIPS applications that were created by the Applied Meteorology Unit (AMU) located at Cape Canaveral Air Force Station (CCAFS), Florida. The first example is the Anvil Threat Corridor Forecast Tool, which produces a shapefile that depicts a graphical threat corridor of the forecast movement of thunderstorm anvil clouds, based on the observed or forecast upper-level winds. This tool is used by the Spaceflight Meteorology Group (SMG) at Johnson Space Center, Texas and 45th Weather Squadron (45 WS) at CCAFS to analyze the threat of natural or space vehicle-triggered lightning over a location. The second example is a launch and landing trajectory tool that produces a DGM file that plots the ground track of space vehicles during launch or landing. The trajectory tool can be used by SMG and the 45 WS forecasters to analyze weather radar imagery along a launch or landing trajectory. The presentation will list the advantages and disadvantages of both file types for creating interactive graphical overlays in future AWIPS applications. Shapefiles are a popular format used extensively in Geographical Information Systems. They are usually used in AWIPS to depict static map backgrounds. A shapefile stores the geometry and attribute information of spatial features in a dataset (ESRI 1998). Shapefiles can contain point, line, and polygon features. Each shapefile contains a main file, index file, and a dBASE table. The main file contains a record for each spatial feature, which describes the feature with a list of its vertices. The index file contains the offset of each record from the beginning of the main file. The dBASE table contains records for each attribute. Attributes are commonly used to label spatial features. Shapefiles can be viewed, but not created in AWIPS. As a result, either third-party software can be installed on an AWIPS workstation, or new software must be written to create shapefiles in the correct format.
Premixed polymer concrete overlays.
DOT National Transportation Integrated Search
1990-01-01
The results of a study undertaken to evaluate premixed polymer concrete overlays (PMPCO) over a 3-year period are presented. The PMPCO evaluated were constructed with polyester amide para resin and silica sand 1;. polyester styrene resin 1 and silica...
Polymer concrete overlay test program : interim report.
DOT National Transportation Integrated Search
1974-11-01
This report describes work done on various combinations of monomers and polymer concrete mixes and identifies the mixes showing the greatest potential for use in bridge deck overlays . Presented are test results showing physical properties of various...
Evaluation of a thin-bonded Portland cement concrete pavement overlay.
DOT National Transportation Integrated Search
1996-01-01
This report discusses the performance of the Virginia Department of Transportation's first modern rehabilitation project involving a thin-bonded portland cement concrete overlay of an existing jointed concrete pavement. The performance of the rigid o...
Research notes : geotextile fabrics under asphalt concrete overlays.
DOT National Transportation Integrated Search
1992-12-01
Last year, the City of Portland decided to place geotextile fabrics under asphalt concrete overlays for pavement reinforcement and crack retardation. The City expected the following benefits from using the fabrics: retardation of reflective cracks, r...
Measuring, achieving and promoting smoothness of Virginia's asphalt overlays.
DOT National Transportation Integrated Search
1999-01-01
This study was initiated with the goal of identifying the predominant factors affecting the achievable smoothness of asphalt overlays. In addition, it chronicles the evolution of Virginia's innovative special provision for smoothness, which was devel...
Stress absorbing membrane innerlayer : final report.
DOT National Transportation Integrated Search
1985-04-01
The westbound lanes of the South Baker Interchange-Encina Interchange Section of I-84 were overlayed in 1977. A stress absorbing membrane innerlayer (SAMI), was included in this overlay as an experimental feature. This report is the final evaluation ...
Performance specification for high performance concrete overlays on bridges.
DOT National Transportation Integrated Search
2004-01-01
Hydraulic cement concrete overlays are usually placed on bridges to reduce the infiltration of water and chloride ions and to improve skid resistance, ride quality, and surface appearance. Constructed in accordance with prescription specifications, s...
Overlay field application program, Pennsylvania US-119.
DOT National Transportation Integrated Search
2010-11-01
The Concrete Overly Filed Application program is administered by FHWA and the National Concrete Pavement Technology Center (CP Tech Center). The overall objective of this program is to increase the awareness and knowledge of concrete overlay applicat...
On the influence of latency estimation on dynamic group communication using overlays
NASA Astrophysics Data System (ADS)
Vik, Knut-Helge; Griwodz, Carsten; Halvorsen, Pål
2009-01-01
Distributed interactive applications tend to have stringent latency requirements and some may have high bandwidth demands. Many of them have also very dynamic user groups for which all-to-all communication is needed. In online multiplayer games, for example, such groups are determined through region-of-interest management in the application. We have investigated a variety of group management approaches for overlay networks in earlier work and shown that several useful tree heuristics exist. However, these heuristics require full knowledge of all overlay link latencies. Since this is not scalable, we investigate the effects that latency estimation techqniues have ton the quality of overlay tree constructions. We do this by evaluating one example of our group management approaches in Planetlab and examing how latency estimation techqniues influence their quality. Specifically, we investigate how two well-known latency estimation techniques, Vivaldi and Netvigator, affect the quality of tree building.
NASA Astrophysics Data System (ADS)
Chen, Xi; Lin, Zheng-Zhe
2018-05-01
In recent years, two-dimensional confined catalysis, i.e., the enhanced catalytic reactions in confined space between metal surface and two-dimensional overlayer, makes a hit and opens up a new way to enhance the performance of catalysts. In this work, graphdiyne overlayer was proposed as a more excellent material than graphene or hexagonal boron nitride for two-dimensional confined catalysis on Pt(111) surface. Density functional theory calculations revealed the superiority of graphdiyne overlayer originates from the steric hindrance effect which increases the catalytic ability and lowers the reaction barriers. Moreover, with the big triangle holes as natural gas tunnels, graphdiyne possesses higher efficiency for the transit of gaseous reactants and products than graphene or hexagonal boron nitride. The results in this work would benefit future development of two-dimensional confined catalysis. [Figure not available: see fulltext.
Evaluation of a novel ultra small target technology supporting on-product overlay measurements
NASA Astrophysics Data System (ADS)
Smilde, Henk-Jan H.; den Boef, Arie; Kubis, Michael; Jak, Martin; van Schijndel, Mark; Fuchs, Andreas; van der Schaar, Maurits; Meyer, Steffen; Morgan, Stephen; Wu, Jon; Tsai, Vincent; Wang, Cathy; Bhattacharyya, Kaustuve; Chen, Kai-Hsiung; Huang, Guo-Tsai; Ke, Chih-Ming; Huang, Jacky
2012-03-01
Reducing the size of metrology targets is essential for in-die overlay metrology in advanced semiconductor manufacturing. In this paper, μ-diffraction-based overlay (μDBO) measurements with a YieldStar metrology tool are presented for target-sizes down to 10 × 10 μm2. The μDBO technology enables selection of only the diffraction efficiency information from the grating by efficiently separating it from product structure reflections. Therefore, μDBO targets -even when located adjacent to product environment- give excellent correlation with 40 × 160 μm2 reference targets. Although significantly smaller than standard scribe-line targets, they can achieve total-measurement-uncertainty values of below 0.5 nm on a wide range of product layers. This shows that the new μDBO technique allows for accurate metrology on ultra small in-die targets, while retaining the excellent TMU performance of diffraction-based overlay metrology.
Study of behaviors of aluminum overlayers deposited on uranium via AES, EELS, and XPS
NASA Astrophysics Data System (ADS)
Liu, Kezhao; Luo, Lizhu; Zhou, Wei; Yang, Jiangrong; Xiao, Hong; Hong, Zhanglian; Yang, Hui
2013-04-01
Aluminum overlayers on uranium were prepared by sputtering at room temperature in an ultra-high vacuum chamber. The growth mode of aluminum overlayers and behaviors of the Al/U interface reaction were studied in situ by auger electron spectroscopy, electron energy loss spectroscopy, and X-ray photoelectron spectroscopy. The results suggested that the interdiffusion took place at the Al/U interface during the initial stage of deposition. The U4f spectra of the Al/U interface showed strong correlation satellites at binding energies of 380.4 and 392.7 eV and plasma loss features at 404.2 eV, respectively. The interactions between aluminum and uranium yielded the intermetallic compound of UAlx, inducing the shift to a low binding energy for Al2p peaks. The results indicated that aluminum overlayers were formed on the uranium by sputtering in an island growth mode.
Cooperative Resource Pricing in Service Overlay Networks for Mobile Agents
NASA Astrophysics Data System (ADS)
Nakano, Tadashi; Okaie, Yutaka
The success of peer-to-peer overlay networks depends on cooperation among participating peers. In this paper, we investigate the degree of cooperation among individual peers required to induce globally favorable properties in an overlay network. Specifically, we consider a resource pricing problem in a market-oriented overlay network where participating peers sell own resources (e.g., CPU cycles) to earn energy which represents some money or rewards in the network. In the resource pricing model presented in this paper, each peer sets the price for own resource based on the degree of cooperation; non-cooperative peers attempt to maximize their own energy gains, while cooperative peers maximize the sum of own and neighbors' energy gains. Simulation results are presented to demonstrate that the network topology is an important factor influencing the minimum degree of cooperation required to increase the network-wide global energy gain.
Maxillary overlay removable partial dentures for the restoration of worn teeth.
Fonseca, Júlio; Nicolau, Pedro; Daher, Tony
2011-04-01
Prolonged tooth maintenance by a more aged population considerably increases the probability of dentists having to treat patients with high levels of tooth wear. Pathological tooth wear, caused primarily by parafunction, seems to be a growing problem that affects a large number of adult patients. The clinical report presents a case of a partially edentulous patient with an elevated degree of wear in the upper jaw caused by attrition and erosion, rehabilitated with a maxillary overlay removable partial denture (ORPD) consisting of a chrome-cobalt (Cr-Co) framework with anterior acrylic resin veneers, posterior cast overlays, and acrylic resin denture bases. Removable partial prosthesis is a treatment alternative when teeth are found to be severely worn or when the patient needs a simple and economical option. Because economics is a conditional factor of the treatment, the clinician should present different treatment alternatives to the patient, in which the overlay prosthesis can be considered.
Forest Resource Information System (FRIS)
NASA Technical Reports Server (NTRS)
1983-01-01
The technological and economical feasibility of using multispectral digital image data as acquired from the LANDSAT satellites in an ongoing operational forest information system was evaluated. Computer compatible multispectral scanner data secured from the LANDSAT satellites were demonstrated to be a significant contributor to ongoing information systems by providing the added dimensions of synoptic and repeat coverage of the Earth's surface. Major forest cover types of conifer, deciduous, mixed conifer-deciduous and non-forest, were classified well within the bounds of the statistical accuracy of the ground sample. Further, when overlayed with existing maps, the acreage of cover type retains a high level of positional integrity. Maps were digitized by a graphics design system, overlayed and registered onto LANDSAT imagery such that the map data with associated attributes were displayed on the image. Once classified, the analysis results were converted back to map form as a cover type of information. Existing tabular information as represented by inventory is registered geographically to the map base through a vendor provided data management system. The notion of a geographical reference base (map) providing the framework to which imagery and tabular data bases are registered and where each of the three functions of imagery, maps and inventory can be accessed singly or in combination is the very essence of the forest resource information system design.
Godson, Richard H.
1974-01-01
GEOPAC .consists of a series of subroutines to primarily process potential-field geophysical data but other types of data can also be used with the program. The package contains routines to reduce, store, process and display information in two-dimensional or three-dimensional form. Input and output formats are standardized and temporary disk storage permits data sets to be processed by several subroutines in one job step. The subroutines are link-edited in an overlay mode to form one program and they can be executed by submitting a card containing the subroutine name in the input stream.
NASA Astrophysics Data System (ADS)
Steinberg, N.
2017-12-01
There is considerable interest in overlaying climate projections with social vulnerability maps as a mechanism for targeting community adaptation efforts. Yet the identification of relevant factors for adaptation- and resilience-based decisions remain a challenge. Our findings show that successful adaptation interventions are more likely when factors are grouped and spatially represented. By designing a decision-support tool that is focused on informing long-term planning to mitigate the public health impacts of extreme heat, communities can more easily integrate climate, land use, and population characteristics into local planning processes. The ability to compare risks and potential health impacts across census tracts may also position local practitioners to leverage scarce resources. This presentation will discuss the information gaps identified by planners and public health practitioners throughout California and illustrate the spatial variations of key health risk factors.
Artificial Diversity and Defense Security (ADDSec) Final Report.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Chavez, Adrian R.; Hamlet, Jason; Stout, William M.S.
Critical infrastructure systems continue to foster predictable communication patterns and static configurations over extended periods of time. The static nature of these systems eases the process of gathering reconnaissance information that can be used to design, develop, and launch attacks by adversaries. In this research effort, the early phases of an attack vector will be disrupted by randomizing application port numbers, IP addresses, and communication paths dynamically through the use of overlay networks within Industrial Control Systems (ICS). These protective measures convert static systems into "moving targets," adding an additional layer of defense. Additionally, we have developed a framework thatmore » automatically detects and defends against threats within these systems using an ensemble of machine learning algorithms that classify and categorize abnormal behavior. Our proof-of-concept has been demonstrated within a representative ICS environment. Performance metrics of our proof-of-concept have been captured with latency impacts of less than a millisecond, on average.« less
Using fuzzy logic analysis for siting decisions of infiltration trenches for highway runoff control.
Ki, Seo Jin; Ray, Chittaranjan
2014-09-15
Determining optimal locations for best management practices (BMPs), including their field considerations and limitations, plays an important role for effective stormwater management. However, these issues have been often overlooked in modeling studies that focused on downstream water quality benefits. This study illustrates the methodology of locating infiltration trenches at suitable locations from spatial overlay analyses which combine multiple layers that address different aspects of field application into a composite map. Using seven thematic layers for each analysis, fuzzy logic was employed to develop a site suitability map for infiltration trenches, whereas the DRASTIC method was used to produce a groundwater vulnerability map on the island of Oahu, Hawaii, USA. In addition, the analytic hierarchy process (AHP), one of the most popular overlay analyses, was used for comparison to fuzzy logic. The results showed that the AHP and fuzzy logic methods developed significantly different index maps in terms of best locations and suitability scores. Specifically, the AHP method provided a maximum level of site suitability due to its inherent aggregation approach of all input layers in a linear equation. The most eligible areas in locating infiltration trenches were determined from the superposition of the site suitability and groundwater vulnerability maps using the fuzzy AND operator. The resulting map successfully balanced qualification criteria for a low risk of groundwater contamination and the best BMP site selection. The results of the sensitivity analysis showed that the suitability scores were strongly affected by the algorithms embedded in fuzzy logic; therefore, caution is recommended with their use in overlay analysis. Accordingly, this study demonstrates that the fuzzy logic analysis can not only be used to improve spatial decision quality along with other overlay approaches, but also is combined with general water quality models for initial and refined searches for the best locations of BMPs at the sub-basin level. Copyright © 2014. Published by Elsevier B.V.
Smith, Amanda R; Ellison, Alysha L; Robinson, Amanda L; Drake, Maryanne; McDowell, Susan A; Mitchell, James K; Gerard, Patrick D; Heckler, Rachel A; McKillip, John L
2013-04-01
Quality control procedures during food processing may involve direct inoculation of food samples onto appropriate selective media for subsequent enumeration. However, sublethally injured bacteria often fail to grow, enabling them to evade detection and intervention measures and ultimately threaten the health of consumers. This study compares traditional selective and nonselective agar-based overlays versus two commercial systems (Petrifilm and Easygel) for recovery of injured E. coli B-41560 and O157:H7 strains. Bacteria were propagated in tryptic soy broth (TSB), ground beef slurry, and infant milk formula to a density of 10(6) to 10(8) CFU/ml and then were stressed for 6 min either in lactic acid (pH 4.5) or heat shocked for 3 min at 60°C. Samples were pour plated in basal layers of either tryptic soy agar (TSA), sorbitol MacConkey agar (SMAC), or violet red bile agar (VRB) and were resuscitated for 4 h prior to addition of agar overlays. Other stressed bacteria were plated directly onto Petrifilm and Easygel. Results indicate that selective and nonselective agar overlays recovered significantly higher numbers (greater than 1 log) of acid- and heat-injured E. coli O157:H7 from TSB, ground beef, and infant milk formula compared with direct plating onto selective media, Petrifilm, or Easygel, while no significant differences among these media combinations were observed for stressed E. coli B-41560. Nonstressed bacteria from TSB and ground beef were also recovered at densities significantly higher in nonselective TSA-TSA and in VRB-VRB and SMAC-SMAC compared with Petrifilm and Easygel. These data underscore the need to implement food safety measures that address sublethally injured pathogens such as E. coli O157:H7 in order to avoid underestimation of true densities for target pathogens.
Sugimoto, Maki; Yasuda, Hideki; Koda, Keiji; Suzuki, Masato; Yamazaki, Masato; Tezuka, Tohru; Kosugi, Chihiro; Higuchi, Ryota; Watayo, Yoshihisa; Yagawa, Yohsuke; Uemura, Shuichiro; Tsuchiya, Hironori; Azuma, Takeshi
2010-09-01
We applied a new concept of "image overlay surgery" consisting of the integration of virtual reality (VR) and augmented reality (AR) technology, in which dynamic 3D images were superimposed on the patient's actual body surface and evaluated as a reference for surgical navigation in gastrointestinal, hepatobiliary and pancreatic surgery. We carried out seven surgeries, including three cholecystectomies, two gastrectomies and two colectomies. A Macintosh and a DICOM workstation OsiriX were used in the operating room for image analysis. Raw data of the preoperative patient information obtained via MDCT were reconstructed to volume rendering and projected onto the patient's body surface during the surgeries. For accurate registration, OsiriX was first set to reproduce the patient body surface, and the positional coordinates of the umbilicus, left and right nipples, and the inguinal region were fixed as physiological markers on the body surface to reduce the positional error. The registration process was non-invasive and markerlesss, and was completed within 5 min. Image overlay navigation was helpful for 3D anatomical understanding of the surgical target in the gastrointestinal, hepatobiliary and pancreatic anatomies. The surgeon was able to minimize movement of the gaze and could utilize the image assistance without interfering with the forceps operation, reducing the gap from the VR. Unexpected organ injury could be avoided in all procedures. In biliary surgery, the projected virtual cholangiogram on the abdominal wall could advance safely with identification of the bile duct. For early gastric and colorectal cancer, the small tumors and blood vessels, which usually could not be found on the gastric serosa by laparoscopic view, were simultaneously detected on the body surface by carbon dioxide-enhanced MDCT. This provided accurate reconstructions of the tumor and involved lymph node, directly linked with optimization of the surgical procedures. Our non-invasive markerless registration using physiological markers on the body surface reduced logistical efforts. The image overlay technique is a useful tool when highlighting hidden structures, giving more information.
Longevity of highway pavements in Illinois : 2000 update
DOT National Transportation Integrated Search
2002-12-01
Results of the latest round of pavement longevity studies in Illinois provide updated performance data through 2000 for HMAC, JRCP, : and CRCP new construction as well as AC overlays (first, second, and third overlays) of these original pavements. Th...
Styrene-butadiene latex modifiers for bridge deck overlay concrete.
DOT National Transportation Integrated Search
1978-04-01
Styrene-butadiene (S/B) latex modified concrete overlays are being used to protect : new bridge decks from rapid deicer-borne chloride intrusion and also in bridge : deck rehabilitation efforts. The purposes of this research were to evaluate several ...
Polymer concrete overlay test program : users' manual.
DOT National Transportation Integrated Search
1977-12-01
The purpose of this manual is to provide the reader with sufficient information to successfully place a polyester styrene polymer concrete overlay on a bridge deck. Although the binder is a resin, no detailed knowledge of polymer chemistry is needed ...
Latex and microsilica modified concrete bridge deck overlays in Oregon : interim report.
DOT National Transportation Integrated Search
1994-08-01
This interim report presented information collected from 24 bridge deck overlays constructed in Oregon between 1989 and 1993. Decks were placed on a variety of existing structures using hydroblasting, milling and diamond grinding surface preparation....
Ultra-thin whitetopping for general aviation airports in New Mexico.
DOT National Transportation Integrated Search
2002-06-01
Whitetopping is a pavement rehabilitation construction practice where portland cement concrete (PCC) is placed over an existing asphalt concrete pavement as an overlay. Ultra-thin whitetopping (UTW) is generally a thin overlay with a thickness betwee...
Cracking and debonding of a thin fiber reinforced concrete overlay : research brief.
DOT National Transportation Integrated Search
2017-03-01
Experimental tests found that the tensile interfacial energy : increased with fiber-reinforcement. Also bond tests indicated : that interfacial fracture occurred through the overlay mixture and : was proportional to the number of fibers which interse...
Performance assessment of Wisconsin's whitetopping and ultra thin whitetopping projects.
DOT National Transportation Integrated Search
2010-03-01
Whitetopping overlay is a concrete overlay on the prepared existing hot mix asphalt (HMA) pavement to : improve both the structural and functional capability. Its a relatively new rehabilitation technology for : deteriorated HMA. If the slab thick...