Microoptical System And Fabrication Method Therefor

DOEpatents

Sweatt, William C.; Christenson, Todd R.

2005-03-15

Microoptical systems with clear aperture of about one millimeter or less are fabricated from a layer of photoresist using a lithographic process to define the optical elements. A deep X-ray source is typically used to expose the photoresist. Exposure and development of the photoresist layer can produce planar, cylindrical, and radially symmetric micro-scale optical elements, comprising lenses, mirrors, apertures, diffractive elements, and prisms, monolithically formed on a common substrate with the mutual optical alignment required to provide the desired system functionality. Optical alignment can be controlled to better than one micron accuracy. Appropriate combinations of structure and materials enable optical designs that include corrections for chromatic and other optical aberrations. The developed photoresist can be used as the basis for a molding operation to produce microoptical systems made of a range of optical materials. Finally, very complex microoptical systems can be made with as few as three lithographic exposures.

The development of an SC1 removable si-anti-reflective-coating

NASA Astrophysics Data System (ADS)

Yamada, Shintaro; Ke, Iou-Sheng; Cutler, Charlotte; Cui, Li; LaBeaume, Paul; Greene, Daniel; Popere, Bhooshan; Sullivan, Chris; Leonard, JoAnne; Coley, Suzanne; Wong, Sabrina; Ongayi, Owendi; Cameron, Jim; Clark, Michael B.; Fitzgibbons, Thomas C.

2018-03-01

A trilayer stack of spin-on-carbon (SOC), silicon anti-reflective coating (SiARC) and photoresist (PR) is often used to enable high resolution implant layers for integrated circuit manufacturing. Damage to substrates from SiARC removal using dry etching or aqueous hydrogen fluoride has increased the demand for innovative SiARC materials for implant lithography process. Wet strippable SiARCs (WS-SiARCs) capable of stripping under mild conditions such as SC1 (ammonium hydroxide/hydrogen peroxide/water) while maintaining key performance metrics of standard SiARCs is highly desirable. Minimizing the formation of Si-O-Si linkages by introducing organic crosslink sites was effective to impart SC1 solubility particularly after O2 dry etching. Incorporation of acidic groups onto the crosslinking site further improved SC1 solubility. A new siloxane polymer architecture that has SC1 active functionality in the polymer backbone was developed to further enhance SC1 solubility. A new SiARC formulation based on the new siloxane polymer achieved equivalent lithographic performances to a classic SiARC and SC1 strip rate >240Å/min under a relatively low concentration SC1 condition such as ammonium hydroxide/hydrogen peroxide/water=1/1/40.

Computational approach on PEB process in EUV resist: multi-scale simulation

NASA Astrophysics Data System (ADS)

Kim, Muyoung; Moon, Junghwan; Choi, Joonmyung; Lee, Byunghoon; Jeong, Changyoung; Kim, Heebom; Cho, Maenghyo

2017-03-01

For decades, downsizing has been a key issue for high performance and low cost of semiconductor, and extreme ultraviolet lithography is one of the promising candidates to achieve the goal. As a predominant process in extreme ultraviolet lithography on determining resolution and sensitivity, post exposure bake has been mainly studied by experimental groups, but development of its photoresist is at the breaking point because of the lack of unveiled mechanism during the process. Herein, we provide theoretical approach to investigate underlying mechanism on the post exposure bake process in chemically amplified resist, and it covers three important reactions during the process: acid generation by photo-acid generator dissociation, acid diffusion, and deprotection. Density functional theory calculation (quantum mechanical simulation) was conducted to quantitatively predict activation energy and probability of the chemical reactions, and they were applied to molecular dynamics simulation for constructing reliable computational model. Then, overall chemical reactions were simulated in the molecular dynamics unit cell, and final configuration of the photoresist was used to predict the line edge roughness. The presented multiscale model unifies the phenomena of both quantum and atomic scales during the post exposure bake process, and it will be helpful to understand critical factors affecting the performance of the resulting photoresist and design the next-generation material.

Silicon Micromachined Microlens Array for THz Antennas

NASA Technical Reports Server (NTRS)

Lee, Choonsup; Chattopadhyay, Goutam; Mehdi, IImran; Gill, John J.; Jung-Kubiak, Cecile D.; Llombart, Nuria

2013-01-01

5 5 silicon microlens array was developed using a silicon micromachining technique for a silicon-based THz antenna array. The feature of the silicon micromachining technique enables one to microfabricate an unlimited number of microlens arrays at one time with good uniformity on a silicon wafer. This technique will resolve one of the key issues in building a THz camera, which is to integrate antennas in a detector array. The conventional approach of building single-pixel receivers and stacking them to form a multi-pixel receiver is not suited at THz because a single-pixel receiver already has difficulty fitting into mass, volume, and power budgets, especially in space applications. In this proposed technique, one has controllability on both diameter and curvature of a silicon microlens. First of all, the diameter of microlens depends on how thick photoresist one could coat and pattern. So far, the diameter of a 6- mm photoresist microlens with 400 m in height has been successfully microfabricated. Based on current researchers experiences, a diameter larger than 1-cm photoresist microlens array would be feasible. In order to control the curvature of the microlens, the following process variables could be used: 1. Amount of photoresist: It determines the curvature of the photoresist microlens. Since the photoresist lens is transferred onto the silicon substrate, it will directly control the curvature of the silicon microlens. 2. Etching selectivity between photoresist and silicon: The photoresist microlens is formed by thermal reflow. In order to transfer the exact photoresist curvature onto silicon, there needs to be etching selectivity of 1:1 between silicon and photoresist. However, by varying the etching selectivity, one could control the curvature of the silicon microlens. The figure shows the microfabricated silicon microlens 5 x5 array. The diameter of the microlens located in the center is about 2.5 mm. The measured 3-D profile of the microlens surface has a smooth curvature. The measured height of the silicon microlens is about 280 microns. In this case, the original height of the photoresist was 210 microns. The change was due to the etching selectivity of 1.33 between photoresist and silicon. The measured surface roughness of the silicon microlens shows the peak-to-peak surface roughness of less than 0.5 microns, which is adequate in THz frequency. For example, the surface roughness should be less than 7 microns at 600 GHz range. The SEM (scanning electron microscope) image of the microlens confirms the smooth surface. The beam pattern at 550 GHz shows good directivity.

Multi-Functional, Micro Electromechanical Silicon Carbide Accelerometer

NASA Technical Reports Server (NTRS)

Okojie, Robert S. (Inventor)

2004-01-01

A method of bulk manufacturing SiC sensors is disclosed and claimed. Materials other than SiC may be used as the substrate material. Sensors requiring that the SiC substrate be pierced are also disclosed and claimed. A process flow reversal is employed whereby the metallization is applied first before the recesses are etched into or through the wafer. Aluminum is deposited on the entire planar surface of the metallization. Photoresist is spun onto the substantially planar surface of the Aluminum which is subsequently masked (and developed and removed). Unwanted Aluminum is etched with aqueous TMAH and subsequently the metallization is dry etched. Photoresist is spun onto the still substantially planar surface of Aluminum and oxide and then masked (and developed and removed) leaving the unimidized photoresist behind. Next, ITO is applied over the still substantially planar surface of Aluminum, oxide and unimidized photoresist. Unimidized and exposed photoresist and ITO directly above it are removed with Acetone. Next, deep reactive ion etching attacks exposed oxide not protected by ITO. Finally, hot phosphoric acid removes the Al and ITO enabling wires to connect with the metallization. The back side of the SiS wafer may be also etched.

Use of direct washing of chemical dispense nozzle for defect control

NASA Astrophysics Data System (ADS)

Linnane, Michael; Mack, George; Longstaff, Christopher; Winter, Thomas

2006-03-01

Demands for continued defect reduction in 300mm IC manufacturing are driving process engineers to examine all aspects of the chemical apply process for improvement. Historically, the defect contribution from photoresist apply nozzles has been minimized through a carefully controlled process of "dummy dispenses" to keep the photoresist in the tip "fresh" and remove any solidified material, a preventive maintenance regime involving periodic cleaning or replacing of the nozzles, and reliance on a pool of solvent within the nozzle storage block to keep the photoresist from solidifying at the nozzle tip. The industry standard has worked well for the most part but has limitations in terms of cost effectiveness and absolute defect elimination. In this study, we investigate the direct washing of the chemical apply nozzle to reduce defects seen on the coated wafer. Data is presented on how the direct washing of the chemical dispense nozzle can be used to reduce coating related defects, reduce material costs from the reduction of "dummy dispense", and can reduce equipment downtime related to nozzle cleaning or replacement.

Microbolometer SU-8 photoresist microstructure with cytochrome c protein as a sensing pixel for microbolometer

NASA Astrophysics Data System (ADS)

Lai, Jian-Lun; Su, Guo-Dung J.

2012-08-01

There are two important parts in Microbolometer: the high TCR sensing material and low thermal conductance. The high TCR material cytochrome c protein is a good candidate for infrared detection. Our group already demonstrated cytochrome c thin film has high TCR on the top of SU8 surface that has been published in Proc. of SPIE (2011). Because the very low thermal conductivity of SU-8, we proposed a new concept of SU-8 photoresist thermal insulation desk structure, and used the exposure dose method to establish it. Although exposure dose method is very sensitive to exposure time and PEB time, we successfully investigated the right recipe to create new desk insulation structure which with different height. We also explored the relationship between mask II exposure time and desktop thickness, and how the post-exposure baking (PEB) time influenced our structure. Our SU-8 photoresist insulation structure fabrication process is much easier and cheaper than present SiNx fabrication process. The desk shape structure can have low thermal conductance of 6.681*10-6 W/K. The easy-made SU-8 microstructures and cytochrome c thin films that and can reduce the cost of IR microbolometer. We believe that it is possible to fabricate a new generation of microbolometer based on cytochrome c protein and SU-8 photoresist microstructures.

Removal of ion-implanted photoresists on GaAs using two organic solvents in sequence

NASA Astrophysics Data System (ADS)

Oh, Eunseok; Na, Jihoon; Lee, Seunghyo; Lim, Sangwoo

2016-07-01

Organic solvents can effectively remove photoresists on III-V channels without damage or etching of the channel material during the process. In this study, a two-step sequential photoresist removal process using two different organic solvents was developed to remove implanted ArF and KrF photoresists at room temperature. The effects of organic solvents with either low molar volumes or high affinities for photoresists were evaluated to find a proper combination that can effectively remove high-dose implanted photoresists without damaging GaAs surfaces. The performance of formamide, acetonitrile, nitromethane, and monoethanolamine for the removal of ion-implanted ArF and KrF photoresists were compared using a two-step sequential photoresist removal process followed by treatment in dimethyl sulfoxide (DMSO). Among the various combinations, the acetonitrile + DMSO two-step sequence exhibited the best removal of photoresists that underwent ion implantation at doses of 5 × 1013-5 × 1015 atoms/cm2 on both flat and trench-structured GaAs surfaces. The ability of the two-step process using organic solvents to remove the photoresists can be explained by considering the affinities of solvents for a polymer and its permeability through the photoresist.

Multi-functional micro electromechanical devices and method of bulk manufacturing same

NASA Technical Reports Server (NTRS)

Okojie, Robert S. (Inventor)

2004-01-01

A method of bulk manufacturing SiC sensors is disclosed and claimed. Materials other than SiC may be used as the substrate material. Sensors requiring that the SiC substrate be pierced are also disclosed and claimed. A process flow reversal is employed whereby the metallization is applied first before the recesses are etched into or through the wafer. Aluminum is deposited on the entire planar surface of the metallization. Photoresist is spun onto the substantially planar surface of the Aluminum which is subsequently masked (and developed and removed). Unwanted Aluminum is etched with aqueous TMAH and subsequently the metallization is dry etched. Photoresist is spun onto the still substantially planar surface of Aluminum and oxide and then masked (and developed and removed) leaving the unimidized photoresist behind. Next, ITO is applied over the still substantially planar surface of Aluminum, oxide and unimidized photoresist. Unimidized and exposed photoresist and ITO directly above it are removed with Acetone. Next, deep reactive ion etching attacks exposed oxide not protected by ITO. Finally, hot phosphoric acid removes the Al and ITO enabling wires to connect with the metallization. The back side of the SiC wafer may be also be etched.

Modeling Thermal Effects for Simulation of Post Exposure Baking (PEB) Process in Positive Photoresist

NASA Astrophysics Data System (ADS)

Asai, Satoru; Hanyu, Isamu; Nunokawa, Mitsuji; Abe, Masayuki

1991-03-01

We studied the thermal effects in a positive photoresist during post exposure baking (PEB). Infrared analysis and the reduced dissolution rate in the exposed resist suggest that the carboxylic acid is decreased and/or that ECA solvent evaporates. In order to simulate the effects, we assume that the concentration of the alkali-soluble material (carboxylic acid) decreases equivalently. Our model explains PEB and enables its effects to be simulated.

Thermodynamic Behavior Research Analysis of Twin-roll Casting Lead Alloy Strip Process

NASA Astrophysics Data System (ADS)

Jiang, Chengcan; Rui, Yannian

2017-03-01

The thermodynamic behavior of twin-roll casting (TRC) lead alloy strip process directly affects the forming of the lead strip, the quality of the lead strip and the production efficiency. However, there is little research on the thermodynamics of lead alloy strip at home and abroad. The TRC lead process is studied in four parameters: the pouring temperature of molten lead, the depth of molten pool, the roll casting speed, and the rolling thickness of continuous casting. Firstly, the thermodynamic model for TRC lead process is built. Secondly, the thermodynamic behavior of the TRC process is simulated with the use of Fluent. Through the thermodynamics research and analysis, the process parameters of cast rolling lead strip can be obtained: the pouring temperature of molten lead: 360-400 °C, the depth of molten pool: 250-300 mm, the roll casting speed: 2.5-3 m/min, the rolling thickness: 8-9 mm. Based on the above process parameters, the optimal parameters(the pouring temperature of molten lead: 375-390 °C, the depth of molten pool: 285-300 mm, the roll casting speed: 2.75-3 m/min, the rolling thickness: 8.5-9 mm) can be gained with the use of the orthogonal experiment. Finally, the engineering test of TRC lead alloy strip is carried out and the test proves the thermodynamic model is scientific, necessary and correct. In this paper, a detailed study on the thermodynamic behavior of lead alloy strip is carried out and the process parameters of lead strip forming are obtained through the research, which provide an effective theoretical guide for TRC lead alloy strip process.

Process for the Production of Star Tracklng [Tracking] Reticles

NASA Technical Reports Server (NTRS)

Smith, Wade O. (Inventor); Toft, Albert R. (Inventor)

1972-01-01

A method for the production of reticles, particularly those for use in outer space, wherein the product is a quartz base coated with highly adherent layers of chromium, chromium-silver, and silver vacuum deposited through a mask, and then coated with an electrodeposit of copper from a copper sulfate solution followed by an electrodeposit of black chromium. The masks are produced by coating a beryllium-copper alloy substrate with a positive working photoresist, developing the photoresist according to a pattern to leave a positive mask, plating uncoated areas with gold, removing the photoresist, coating the substrate with a negative working photoresist, developing the negative working photoresist to expose the base metal of the pattern, and chemically etching the unplated side of the pattern to produce the mask. The mask produced is then used in the vacuum deposition of: (1) chromium metal on the surface of a quartz base to obtain a highly adherent quartz-chromium interface; (2) silver on the chromium deposit, during the final stage of chromium deposit, to produce a silver chromium alloy layer; and (3) silver onto the surface of the alloy layer. The coated quartz base is then coated by electroplating utilizing an acid copper deposit followed by a black chromium electrodeposit to produce the product of the present invention.

Design and fabrication of a diffractive beam splitter for dual-wavelength and concurrent irradiation of process points.

PubMed

Amako, Jun; Shinozaki, Yu

2016-07-11

We report on a dual-wavelength diffractive beam splitter designed for use in parallel laser processing. This novel optical element generates two beam arrays of different wavelengths and allows their overlap at the process points on a workpiece. To design the deep surface-relief profile of a splitter using a simulated annealing algorithm, we introduce a heuristic but practical scheme to determine the maximum depth and the number of quantization levels. The designed corrugations were fabricated in a photoresist by maskless grayscale exposure using a high-resolution spatial light modulator. We characterized the photoresist splitter, thereby validating the proposed beam-splitting concept.

Fabrication of tunable diffraction grating by imprint lithography with photoresist mold

NASA Astrophysics Data System (ADS)

Yamada, Itsunari; Ikeda, Yusuke; Higuchi, Tetsuya

2018-05-01

We fabricated a deformable transmission silicone [poly(dimethylsiloxane)] grating using a two-beam interference method and imprint lithography and evaluated its optical characteristics during a compression process. The grating pattern with 0.43 μm depth and 1.0 μm pitch was created on a silicone surface by an imprinting process with a photoresist mold to realize a simple, low-cost fabrication process. The first-order diffraction transmittance of this grating reached 10.3% at 632.8 nm wavelength. We also measured the relationship between the grating period and compressive stress to the fabricated elements. The grating period changed from 1.0 μm to 0.84 μm by 16.6% compression of the fabricated element in one direction, perpendicular to the grooves, and the first-order diffraction transmittance was 8.6%.

A Molecular- and Nano-Electronics Test (MONET) platform fabricated using extreme ultraviolet lithography.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Dentinger, Paul M.; Cardinale, Gregory F.; Hunter, Luke L.

2003-12-01

We describe the fabrication and characterization of an electrode array test structure, designed for electrical probing of molecules and nanocrystals. We use Extreme Ultraviolet Lithography (EUVL) to define the electrical test platform features. As fabricated, the platform includes nominal electrode gaps of 0 nm, 40 nm, 60 nm, and 80 nm. Additional variation in electrode gap is achieved by controlling the exposure conditions, such as dose and focus. To enable EUVL based nanofabrication, we develop a novel bi-level photoresist process. The bi-level photoresist consists of a combination of a commercially available polydimethylglutarimide (PMGI) bottom layer and an experimental EUVL photoresistmore » top (imaging) layer. We measure the sensitivity of PMGI to EUV exposure dose as a function of photoresist pre-bake temperature, and using this data, optimize a metal lift-off process. Reliable fabrication of 700 Angstrom thick Au structures with sub-1000 Angstrom critical dimensions is achieved, even without the use of a Au adhesion layer, such as Ti. Several test platforms are used to characterize electrical properties of organic molecules deposited as self assembled monolayers.« less

Micropatterning of poly(dimethylsiloxane) using a photoresist lift-off technique for selective electrical insulation of microelectrode arrays

PubMed Central

Park, Jaewon; Kim, Hyun Soo; Han, Arum

2009-01-01

A poly(dimethylsiloxane) (PDMS) patterning method based on a photoresist lift-off technique to make an electrical insulation layer with selective openings is presented. The method enables creating PDMS patterns with small features and various thicknesses without any limitation in the designs and without the need for complicated processes or expensive equipments. Patterned PDMS layers were created by spin-coating liquid phase PDMS on top of a substrate having sacrificial photoresist patterns, followed by a photoresist lift-off process. The thickness of the patterned PDMS layers could be accurately controlled (6.5–24 µm) by adjusting processing parameters such as PDMS spin-coating speeds, PDMS dilution ratios, and sacrificial photoresist thicknesses. PDMS features as small as 15 µm were successfully patterned and the effects of each processing parameter on the final patterns were investigated. Electrical resistance tests between adjacent electrodes with and without the insulation layer showed that the patterned PDMS layer functions properly as an electrical insulation layer. Biocompatibility of the patterned PDMS layer was confirmed by culturing primary neuron cells on top of the layer for up to two weeks. An extensive neuronal network was successfully formed, showing that this PDMS patterning method can be applied to various biosensing microdevices. The utility of this fabrication method was further demonstrated by successfully creating a patterned electrical insulation layer on flexible substrates containing multi-electrode arrays. PMID:19946385

Faster sensitivity and non-antimonite permanent photoresist for MEMS

NASA Astrophysics Data System (ADS)

Misumi, Koichi; Saito, Koji; Yamanouchi, Atsushi; Senzaki, Takahiro; Okui, Toshiki; Honma, Hideo

2006-03-01

Micro Electro Mechanical Systems (MEMS) is a three-dimensional micro-fabrication technology based on photolithography. The fields of application are extensive and wide-ranging. Among the applications, those that have already acquired a large market include acceleration sensors for airbags of automobiles, pressure sensors for engine control, inkjet printer heads and thin film magnetic heads. The market is expected to further expand in the optic and biology-related fields in the future. In the MEMS field, the packaging accounts for the cost, and it is difficult to standardize due to the low production volume of highly specific technology application. A typical application in the MEMS process would be to conduct plating and etching (Deep RIE) through an intermediate layer of photoresist patterns, but there are cases where the photoresist itself is left therein as a permanent film. A photoresist composed of epoxy resin as the main component can form the permanent film through a catalyst of the optical cationic polymerizating initiator. In general, the optical cationic polymerizating initiator is of onium salt with antimonite as the anion group due to the nature of the hardening rate or the exposure energy. This paper presents the development status of a high sensitivity permanent photoresist made of epoxy resin as the main component with non-antimonite optical cationic polymerizating initiator with concerns to the impact to the environment and material for packaging.

Fabrication of a high aspect ratio thick silicon wafer mold and electroplating using flipchip bonding for MEMS applications

NASA Astrophysics Data System (ADS)

Kim, Bong-Hwan; Kim, Jong-Bok

2009-06-01

We have developed a microfabrication process for high aspect ratio thick silicon wafer molds and electroplating using flipchip bonding with THB 151N negative photoresist (JSR micro). This fabrication technique includes large area and high thickness silicon wafer mold electroplating. The process consists of silicon deep reactive ion etching (RIE) of the silicon wafer mold, photoresist bonding between the silicon mold and the substrate, nickel electroplating and a silicon removal process. High thickness silicon wafer molds were made by deep RIE and flipchip bonding. In addition, nickel electroplating was developed. Dry film resist (ORDYL MP112, TOK) and thick negative-tone photoresist (THB 151N, JSR micro) were used as bonding materials. In order to measure the bonding strength, the surface energy was calculated using a blade test. The surface energy of the bonding wafers was found to be 0.36-25.49 J m-2 at 60-180 °C for the dry film resist and 0.4-1.9 J m-2 for THB 151N in the same temperature range. Even though ORDYL MP112 has a better value of surface energy than THB 151N, it has a critical disadvantage when it comes to removing residue after electroplating. The proposed process can be applied to high aspect ratio MEMS structures, such as air gap inductors or vertical MEMS probe tips.

Patterning with metal-oxide EUV photoresist: patterning capability, resist smoothing, trimming, and selective stripping

NASA Astrophysics Data System (ADS)

Mao, Ming; Lazzarino, Frederic; De Schepper, Peter; De Simone, Danilo; Piumi, Daniele; Luong, Vinh; Yamashita, Fumiko; Kocsis, Michael; Kumar, Kaushik

2017-03-01

Inpria metal-oxide photoresist (PR) serves as a thin spin-on patternable hard mask for EUV lithography. Compared to traditional organic photoresists, the ultrathin metal-oxide photoresist ( 12nm after development) effectively mitigates pattern collapse. Because of the high etch resistance of the metal-oxide resist, this may open up significant scope for more aggressive etches, new chemistries, and novel integration schemes. We have previously shown that metal-oxide PR can be successfully used to pattern the block layer for the imec 7-nm technology node[1] and advantageously replace a multiple patterning approach, which significantly reduces the process complexity and effectively decreases the cost. We also demonstrated the formation of 16nm half pitch 1:1 line/space with EUV single print[2], which corresponds to a metal 2 layer for the imec 7-nm technology node. In this paper, we investigate the feasibility of using Inpria's metal-oxide PR for 16nm line/space patterning. In meanwhile, we also explore the different etch process for LWR smoothing, resist trimming and resist stripping.

Multiphysical FE-analysis of a front-end bending phenomenon in a hot strip mill

NASA Astrophysics Data System (ADS)

Ilmola, Joonas; Seppälä, Oskari; Leinonen, Olli; Pohjonen, Aarne; Larkiola, Jari; Jokisaari, Juha; Putaansuu, Eero

2018-05-01

In hot steel rolling processes, a slab is generally rolled to a transfer bar in a roughing process and to a strip in a hot strip rolling process. Over several rolling passes the front-end may bend upward or downward due to asymmetrical rolling conditions causing entry problems in the next rolling pass. Many different factors may affect the front-end bending phenomenon and are very challenging to measure. Thus, a customized finite element model is designed and built to simulate the front-end bending phenomenon in a hot strip rolling process. To simulate the functioning of the hot strip mill precisely, automated controlling logic of the mill must be considered. In this paper we studied the effect of roll bite friction conditions and amount of reduction on the front-end bending phenomenon in a hot strip rolling process.

Efficient hybrid evolutionary algorithm for optimization of a strip coiling process

NASA Astrophysics Data System (ADS)

Pholdee, Nantiwat; Park, Won-Woong; Kim, Dong-Kyu; Im, Yong-Taek; Bureerat, Sujin; Kwon, Hyuck-Cheol; Chun, Myung-Sik

2015-04-01

This article proposes an efficient metaheuristic based on hybridization of teaching-learning-based optimization and differential evolution for optimization to improve the flatness of a strip during a strip coiling process. Differential evolution operators were integrated into the teaching-learning-based optimization with a Latin hypercube sampling technique for generation of an initial population. The objective function was introduced to reduce axial inhomogeneity of the stress distribution and the maximum compressive stress calculated by Love's elastic solution within the thin strip, which may cause an irregular surface profile of the strip during the strip coiling process. The hybrid optimizer and several well-established evolutionary algorithms (EAs) were used to solve the optimization problem. The comparative studies show that the proposed hybrid algorithm outperformed other EAs in terms of convergence rate and consistency. It was found that the proposed hybrid approach was powerful for process optimization, especially with a large-scale design problem.

Choosing order of operations to accelerate strip structure analysis in parameter range

NASA Astrophysics Data System (ADS)

Kuksenko, S. P.; Akhunov, R. R.; Gazizov, T. R.

2018-05-01

The paper considers the issue of using iteration methods in solving the sequence of linear algebraic systems obtained in quasistatic analysis of strip structures with the method of moments. Using the analysis of 4 strip structures, the authors have proved that additional acceleration (up to 2.21 times) of the iterative process can be obtained during the process of solving linear systems repeatedly by means of choosing a proper order of operations and a preconditioner. The obtained results can be used to accelerate the process of computer-aided design of various strip structures. The choice of the order of operations to accelerate the process is quite simple, universal and could be used not only for strip structure analysis but also for a wide range of computational problems.

Dose Control System in the Optima XE Single Wafer High Energy Ion Implanter

DOE Office of Scientific and Technical Information (OSTI.GOV)

Satoh, Shu; Yoon, Jongyoon; David, Jonathan

2011-01-07

Photoresist outgassing can significantly compromise accurate dosimetry of high energy implants. High energy implant even at a modest beam current produces high beam powers which create significantly worse outgassing than low and medium energy implants and the outgassing continues throughout the implant due to the low dose in typical high energy implant recipes. In the previous generation of high energy implanters, dose correction by monitoring of process chamber pressure during photoresist outgassing has been used. However, as applications diversify and requirements change, the need arises for a more versatile photoresist correction system to match the versatility of a single wafermore » high energy ion implanter. We have successfully developed a new dosimetry system for the Optima XE single wafer high energy ion implanter which does not require any form of compensation due to the implant conditions. This paper describes the principles and performance of this new dose system.« less

On-line photolithography modeling using spectrophotometry and Prolith/2

NASA Astrophysics Data System (ADS)

Engstrom, Herbert L.; Beacham, Jeanne E.

1994-05-01

Spectrophotometry has been applied to optimizing photolithography processes in semiconductor manufacturing. For many years thin film measurement systems have been used in manufacturing for controlling film deposition processes. The combination of film thickness mapping with photolithography modeling has expanded the applications of this technology. Experimental measurements of dose-to-clear, the minimum light exposure dose required to fully develop a photoresist, are described. It is shown how dose-to-clear and photoresist contrast may be determined rapidly and conveniently from measurements of a dose exposure matrix on a monitor wafer. Such experimental measurements may underestimate the dose-to- clear because of thickness variations of the photoresist and underlying layers on the product wafer. Online modeling of the photolithographic process together with film thickness maps of the entire wafer can overcome this problem. Such modeling also provides maps of dose-to- clear and resist linewidth that can be used to estimate and optimize yield.

Sequential shrink photolithography for plastic microlens arrays

NASA Astrophysics Data System (ADS)

Dyer, David; Shreim, Samir; Jayadev, Shreshta; Lew, Valerie; Botvinick, Elliot; Khine, Michelle

2011-07-01

Endeavoring to push the boundaries of microfabrication with shrinkable polymers, we have developed a sequential shrink photolithography process. We demonstrate the utility of this approach by rapidly fabricating plastic microlens arrays. First, we create a mask out of the children's toy Shrinky Dinks by simply printing dots using a standard desktop printer. Upon retraction of this pre-stressed thermoplastic sheet, the dots shrink to a fraction of their original size, which we then lithographically transfer onto photoresist-coated commodity shrink wrap film. This shrink film reduces in area by 95% when briefly heated, creating smooth convex photoresist bumps down to 30 µm. Taken together, this sequential shrink process provides a complete process to create microlenses, with an almost 99% reduction in area from the original pattern size. Finally, with a lithography molding step, we emboss these bumps into optical grade plastics such as cyclic olefin copolymer for functional microlens arrays.

Sequential shrink photolithography for plastic microlens arrays.

PubMed

Dyer, David; Shreim, Samir; Jayadev, Shreshta; Lew, Valerie; Botvinick, Elliot; Khine, Michelle

2011-07-18

Endeavoring to push the boundaries of microfabrication with shrinkable polymers, we have developed a sequential shrink photolithography process. We demonstrate the utility of this approach by rapidly fabricating plastic microlens arrays. First, we create a mask out of the children's toy Shrinky Dinks by simply printing dots using a standard desktop printer. Upon retraction of this pre-stressed thermoplastic sheet, the dots shrink to a fraction of their original size, which we then lithographically transfer onto photoresist-coated commodity shrink wrap film. This shrink film reduces in area by 95% when briefly heated, creating smooth convex photoresist bumps down to 30 µm. Taken together, this sequential shrink process provides a complete process to create microlenses, with an almost 99% reduction in area from the original pattern size. Finally, with a lithography molding step, we emboss these bumps into optical grade plastics such as cyclic olefin copolymer for functional microlens arrays.

Rigorous ILT optimization for advanced patterning and design-process co-optimization

NASA Astrophysics Data System (ADS)

Selinidis, Kosta; Kuechler, Bernd; Cai, Howard; Braam, Kyle; Hoppe, Wolfgang; Domnenko, Vitaly; Poonawala, Amyn; Xiao, Guangming

2018-03-01

Despite the large difficulties involved in extending 193i multiple patterning and the slow ramp of EUV lithography to full manufacturing readiness, the pace of development for new technology node variations has been accelerating. Multiple new variations of new and existing technology nodes have been introduced for a range of device applications; each variation with at least a few new process integration methods, layout constructs and/or design rules. This had led to a strong increase in the demand for predictive technology tools which can be used to quickly guide important patterning and design co-optimization decisions. In this paper, we introduce a novel hybrid predictive patterning method combining two patterning technologies which have each individually been widely used for process tuning, mask correction and process-design cooptimization. These technologies are rigorous lithography simulation and inverse lithography technology (ILT). Rigorous lithography simulation has been extensively used for process development/tuning, lithography tool user setup, photoresist hot-spot detection, photoresist-etch interaction analysis, lithography-TCAD interactions/sensitivities, source optimization and basic lithography design rule exploration. ILT has been extensively used in a range of lithographic areas including logic hot-spot fixing, memory layout correction, dense memory cell optimization, assist feature (AF) optimization, source optimization, complex patterning design rules and design-technology co-optimization (DTCO). The combined optimization capability of these two technologies will therefore have a wide range of useful applications. We investigate the benefits of the new functionality for a few of these advanced applications including correction for photoresist top loss and resist scumming hotspots.

Sequential shrink photolithography for plastic microlens arrays

PubMed Central

Dyer, David; Shreim, Samir; Jayadev, Shreshta; Lew, Valerie; Botvinick, Elliot; Khine, Michelle

2011-01-01

Endeavoring to push the boundaries of microfabrication with shrinkable polymers, we have developed a sequential shrink photolithography process. We demonstrate the utility of this approach by rapidly fabricating plastic microlens arrays. First, we create a mask out of the children’s toy Shrinky Dinks by simply printing dots using a standard desktop printer. Upon retraction of this pre-stressed thermoplastic sheet, the dots shrink to a fraction of their original size, which we then lithographically transfer onto photoresist-coated commodity shrink wrap film. This shrink film reduces in area by 95% when briefly heated, creating smooth convex photoresist bumps down to 30 µm. Taken together, this sequential shrink process provides a complete process to create microlenses, with an almost 99% reduction in area from the original pattern size. Finally, with a lithography molding step, we emboss these bumps into optical grade plastics such as cyclic olefin copolymer for functional microlens arrays. PMID:21863126

High Precision Metal Thin Film Liftoff Technique

NASA Technical Reports Server (NTRS)

Brown, Ari D. (Inventor); Patel, Amil A. (Inventor)

2015-01-01

A metal film liftoff process includes applying a polymer layer onto a silicon substrate, applying a germanium layer over the polymer layer to create a bilayer lift off mask, applying a patterned photoresist layer over the germanium layer, removing an exposed portion of the germanium layer, removing the photoresist layer and a portion of the polymer layer to expose a portion of the substrate and create an overhanging structure of the germanium layer, depositing a metal film over the exposed portion of the substrate and the germanium layer, and removing the polymer and germanium layers along with the overlaying metal film.

Nanoparticle photoresist studies for EUV lithography

NASA Astrophysics Data System (ADS)

Kasahara, Kazuki; Xu, Hong; Kosma, Vasiliki; Odent, Jeremy; Giannelis, Emmanuel P.; Ober, Christopher K.

2017-03-01

EUV (extreme ultraviolet) lithography is one of the most promising candidates for next generation lithography. The main challenge for EUV resists is to simultaneously satisfy resolution, LWR (line-width roughness) and sensitivity requirements according to the ITRS roadmap. Though polymer type CAR (chemically amplified resist) is the currently standard photoresist, entirely new resist platforms are required due to the performance targets of smaller process nodes. In this paper, recent progress in nanoparticle photoresists which Cornell University has intensely studied is discussed. Lithography performance, especially scum elimination, improvement studies with the dissolution rate acceleration concept and new metal core applications are described.

Microstructure fabrication process induced modulations in CVD graphene

NASA Astrophysics Data System (ADS)

Matsubayashi, Akitomo; Zhang, Zhenjun; Lee, Ji Ung; LaBella, Vincent P.

2014-12-01

The systematic Raman spectroscopic study of a "mimicked" graphene device fabrication is presented. Upon photoresist baking, compressive stress is induced in the graphene which disappears after it is removed. The indirect irradiation from the electron beam (through the photoresist) does not significantly alter graphene characteristic Raman peaks indicating that graphene quality is preserved upon the exposure. The 2D peak shifts and the intensity ratio of 2D and G band, I(2D)/I(G), decreases upon direct metal deposition (Co and Py) suggesting that the electronic modulation occurs due to sp2 C-C bond weakening. In contrast, a thin metal oxide film deposited graphene does not show either the significant 2D and G peaks shift or I(2D)/I(G) decrease upon the metal deposition suggesting the oxide protect the graphene quality in the fabrication process.

Presidential Green Chemistry Challenge: 1997 Small Business Award

EPA Pesticide Factsheets

Presidential Green Chemistry Challenge 1997 award winner, Legacy Systems, developed the Coldstrip process, which uses only water and oxygen to remove photoresist from silicon semiconductors. It replaces corrosive acids.

A Module Experimental Process System Development Unit (MEPSDU)

NASA Technical Reports Server (NTRS)

1981-01-01

Design work for a photovoltaic module, fabricated using single crystal silicon dendritic web sheet material, resulted in the identification of surface treatment to the module glass superstrate which improved module efficiencies. A final solar module environmental test, a simulated hailstone impact test, was conducted on full size module superstrates to verify that the module's tempered glass superstrate can withstand specified hailstone impacts near the corners and edges of the module. Process sequence design work on the metallization process selective, liquid dopant investigation, dry processing, and antireflective/photoresist application technique tasks, and optimum thickness for Ti/Pd are discussed. A noncontact cleaning method for raw web cleaning was identified and antireflective and photoresist coatings for the dendritic webs were selected. The design of a cell string conveyor, an interconnect feed system, rolling ultrasonic spot bonding heat, and the identification of the optimal commercially available programmable control system are also discussed. An economic analysis to assess cost goals of the process sequence is also given.

High resolution, low cost solar cell contact development. Quarterly technical progress and schedule report, September 28, 1980

DOE Office of Scientific and Technical Information (OSTI.GOV)

Mardesich, N.

The scope of the contract covers the development and evaluation of forming solar cell collector grid contacts by the MIDFILM process. This is a proprietary process developed by the Ferro Corporation which is a subcontractor for the program. The MIDFILM process attains line resolution characteristics of photoresist methods with processing related to screen printing. The surface to be processed is first coated with a thin layer of photoresist material. Upon exposure to ultraviolet light through a suitable mask, the resist in the non-pattern area cross-links and becomes hard. The unexposed pattern areas remain tacky. The conductor material is applied inmore » the form of a dry mixture of metal and frit particles which adhere to the tacky pattern area. The assemblage is then fired to ash the photopolymer and sinter the fritted conductor powder. Effort was concentrated during this period on the establishment, optimization and identification of problem areas of the MIDFILM process. Progress is reported. (WHK)« less

Process effects resulting from an increased BARC thickness

NASA Astrophysics Data System (ADS)

Eakin, Ronald J.; Detweiler, Shangting F.; Stagaman, Gregory J.; Tesauro, Mark R.; Spak, Mark A.; Dammel, Ralph R.

1997-07-01

Process improvements attributed to the use of bottom anti- reflective coatings (B.A.R.C.s) are well documented. As our experience with these materials improves, so does our understanding of additional optimization. Recent supplier experiments suggest an increase in the thickness of AZR BARLiTM (bottom anti-reflective layer i-line) solution to reduce photoresist swing curve ratios. Also, changes in thin film stack on common substrates can adversely affect the degree of photoresist reflective notching. It is therefore of extreme importance to determine optimum thickness(es) of a B.A.R.C. material to ensure maximum process potential. We document several process effects in the conversion of a SRAM test device (0.38 - 0.45 micrometers) from a 650 angstrom to a 2000 angstrom BARLiTM film thickness using conventional i-line photolithography. Critical dimension (CD) uniformity and depth of focus (DOF) are evaluated. Defect density between the two processes are compared before and after etch employing optical metrology and electrical test structures. Sensitivity of overlay as a function of BARLiTM film thickness is investigated as well.

Large-scale fabrication of vertically aligned ZnO nanowire arrays

DOEpatents

Wang, Zhong L; Das, Suman; Xu, Sheng; Yuan, Dajun; Guo, Rui; Wei, Yaguang; Wu, Wenzhuo

2013-02-05

In a method for growing a nanowire array, a photoresist layer is placed onto a nanowire growth layer configured for growing nanowires therefrom. The photoresist layer is exposed to a coherent light interference pattern that includes periodically alternately spaced dark bands and light bands along a first orientation. The photoresist layer exposed to the coherent light interference pattern along a second orientation, transverse to the first orientation. The photoresist layer developed so as to remove photoresist from areas corresponding to areas of intersection of the dark bands of the interference pattern along the first orientation and the dark bands of the interference pattern along the second orientation, thereby leaving an ordered array of holes passing through the photoresist layer. The photoresist layer and the nanowire growth layer are placed into a nanowire growth environment, thereby growing nanowires from the nanowire growth layer through the array of holes.

Gap Fill Materials Using Cyclodextrin Derivatives in ArF Lithography

NASA Astrophysics Data System (ADS)

Takei, Satoshi; Shinjo, Tetsuya; Sakaida, Yasushi; Hashimoto, Keisuke

2007-11-01

High planarizing gap fill materials based on β-cyclodextrin in ArF photoresist under-layer materials have been developed for fast etching in CF4 gas. Gap fill materials used in the via-first dual damascene process need to have high etch rates to prevent crowning or fencing on top of the trench after etching and a small thickness bias between the dense and blanket areas to minimize issues observed during trench lithography by narrowing the process latitude. Cyclodextrin is a circular oligomer with a nanoscale porous structure that has a high number of oxygen atoms, as calculated using the Ohnishi parameter, providing high etch rates. Additionally, since gap fill materials using cyclodextrin derivatives have low viscosities and molecular weights, they are expected to exhibit excellent flow properties and minimal thermal shrinkage during baking. In this paper, we describe the composition and basic film properties of gap fill materials; planarization in the via-first dual damascene process and etch rates in CF4 gas compared with dextrin with α-glycoside bonds in polysaccharide, poly(2-hydroxypropyl methacrylate) and poly(4-hydroxystyrene). The β-cyclodextrin used in this study was obtained by esterifying the hydroxyl groups of dextrin resulting in improved wettability on via substrates and solubility in photoresist solvents such as propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate and ethyl lactate. Gap fill materials using cyclodextrin derivatives showed good planarization and via filling performance without observing voids in via holes. In addition to superior via filling performance, the etch rate of gap fill materials using β-cyclodextrin derivatives was 2.8-2.9 times higher than that of an ArF photoresist, evaluated under CF4 gas conditions by reactive ion etching. These results were attributed to the combination of both nanoscale porous structures and a high density of oxygen atoms in our gap fill materials using cyclodextrin derivatives. The cyclodextrin derivatives may be applicable as a new type of sacrificial material under the photoresist in ArF lithography.

Photolithography and Selective Etching of an Array of Quartz Tuning Fork Resonators with Improved Impact Resistance Characteristics

NASA Astrophysics Data System (ADS)

Lee, Sungkyu

2001-08-01

Quartz tuning fork blanks with improved impact-resistant characteristics for use in Qualcomm mobile station modem (MSM)-3000 central processing unit (CPU) chips for code division multiple access (CDMA), personal communication system (PCS), and global system for mobile communication (GSM) systems were designed using finite element method (FEM) analysis and suitable processing conditions were determined for the reproducible precision etching of a Z-cut quartz wafer into an array of tuning forks. Negative photoresist photolithography for the additive process was used in preference to positive photoresist photolithography for the subtractive process to etch the array of quartz tuning forks. The tuning fork pattern was transferred via a conventional photolithographical chromium/quartz glass template using a standard single-sided aligner and subsequent negative photoresist development. A tightly adhering and pinhole-free 600/2000 Å chromium/gold mask was coated over the developed photoresist pattern which was subsequently stripped in acetone. This procedure was repeated on the back surface of the wafer. With the protective metallization area of the tuning fork geometry thus formed, etching through the quartz wafer was performed at 80°C in a ± 1.5°C controlled bath containing a concentrated solution of ammonium bifluoride to remove the unwanted areas of the quartz wafer. The quality of the quartz wafer surface finish after quartz etching depended primarily on the surface finish of the quartz wafer prior to etching and the quality of quartz crystals used. Selective etching of a 100 μm quartz wafer could be achieved within 90 min at 80°C. A selective etching procedure with reproducible precision has thus been established and enables the photolithographic mass production of miniature tuning fork resonators.

Thick resist for MEMS processing

NASA Astrophysics Data System (ADS)

Brown, Joe; Hamel, Clifford

2001-11-01

The need for technical innovation is always present in today's economy. Microfabrication methods have evolved in support of the demand for smaller and faster integrated circuits with price performance improvements always in the scope of the manufacturing design engineer. The dispersion of processing technology spans well beyond IC fabrication today with batch fabrication and wafer scale processing lending advantages to MEMES applications from biotechnology to consumer electronics from oil exploration to aerospace. Today the demand for innovative processing techniques that enable technology is apparent where only a few years ago appeared too costly or not reliable. In high volume applications where yield and cost improvements are measured in fractions of a percent it is imperative to have process technologies that produce consistent results. Only a few years ago thick resist coatings were limited to thickness less than 20 microns. Factors such as uniformity, edge bead and multiple coatings made high volume production impossible. New developments in photoresist formulation combined with advanced coating equipment techniques that closely controls process parameters have enable thick photoresist coatings of 70 microns with acceptable uniformity and edge bead in one pass. Packaging of microelectronic and micromechanical devices is often a significant cost factor and a reliability issue for high volume low cost production. Technologies such as flip- chip assembly provide a solution for cost and reliability improvements over wire bond techniques. The processing for such technology demands dimensional control and presents a significant cost savings if it were compatible with mainstream technologies. Thick photoresist layers, with good sidewall control would allow wafer-bumping technologies to penetrate the barriers to yield and production where costs for technology are the overriding issue. Single pass processing is paramount to the manufacturability of packaging technology. Uniformity and edge bead control defined the success of process implementation. Today advanced packaging solutions are created with thick photoresist coatings. The techniques and results will be presented.

Method and apparatus for micromachining using hard X-rays

DOEpatents

Siddons, D.P.; Johnson, E.D.; Guckel, H.; Klein, J.L.

1997-10-21

An X-ray source such as a synchrotron which provides a significant spectral content of hard X-rays is used to expose relatively thick photoresist such that the portions of the photoresist at an exit surface receive at least a threshold dose sufficient to render the photoresist susceptible to a developer, while the entrance surface of the photoresist receives an exposure which does not exceed a power limit at which destructive disruption of the photoresist would occur. The X-ray beam is spectrally shaped to substantially eliminate lower energy photons while allowing a substantial flux of higher energy photons to pass through to the photoresist target. Filters and the substrate of the X-ray mask may be used to spectrally shape the X-ray beam. Machining of photoresists such as polymethylmethacrylate to micron tolerances may be obtained to depths of several centimeters, and multiple targets may be exposed simultaneously. The photoresist target may be rotated and/or translated in the beam to form solids of rotation and other complex three-dimensional structures. 21 figs.

Method and apparatus for micromachining using hard X-rays

DOEpatents

Siddons, David Peter; Johnson, Erik D.; Guckel, Henry; Klein, Jonathan L.

1997-10-21

An X-ray source such as a synchrotron which provides a significant spectral content of hard X-rays is used to expose relatively thick photoresist such that the portions of the photoresist at an exit surface receive at least a threshold dose sufficient to render the photoresist susceptible to a developer, while the entrance surface of the photoresist receives an exposure which does not exceed a power limit at which destructive disruption of the photoresist would occur. The X-ray beam is spectrally shaped to substantially eliminate lower energy photons while allowing a substantial flux of higher energy photons to pass through to the photoresist target. Filters and the substrate of the X-ray mask may be used to spectrally shape the X-ray beam. Machining of photoresists such as polymethylmethacrylate to micron tolerances may be obtained to depths of several centimeters, and multiple targets may be exposed simultaneously. The photoresist target may be rotated and/or translated in the beam to form solids of rotation and other complex three-dimensional structures.

Photoresist: Fabrication, Characterization and Its Sensitivity on the Exposures of X-Ray and Ultraviolet

NASA Astrophysics Data System (ADS)

Sutikno; Susilo; Raharja, H. D.

2018-05-01

The epoxy resin-based photoresist is fabricated by mixing of resin (polymer), sodium acetate trihydrate and ethanol in mass variation using heated magnetic stirrer at 100 rpm speed and temperature of 75 °C. Sodium acetate trihydrate and ethanol each play role as photoactive compound (PAC) and solvent, respectively. Photoresist thin films were grown through spin coating method in voltage 5 V during the 60 s and heating temperature of 150 °C for 15 min. To determine photoresist sensitivity, ultraviolet and X-ray were exposed on the photoresist surfaces. The fabricated photoresist properties are densities of 1 g·mL‑1 to 1.23 g·mL‑1, dynamic viscosities of 7 Cp to 22 Cp and kinematic viscosities of 7 Cst to 18 Cst. The absorbances of thin films are in the wavelength range of 350 nm to 1050 nm at the maximum absorbances of 0.2 to 0.5 in the wavelength g-line, h-line, and i-line. The generated maximum current achieved (1.84 × 10‑8) A. The microstructures of epoxy-based photoresist seem homogeneous. The sensitivities of UV exposures show a photochemistry reaction on photoresist occurred, however for X-ray exposure no reaction found.

Method of making low leakage N-channel SOS transistors utilizing positive photoresist masking techniques

NASA Technical Reports Server (NTRS)

Policastro, Steven G. (Inventor); Woo, Dae-Shik (Inventor)

1983-01-01

A self-aligned method of implanting the edges of NMOS/SOS transistors is described. The method entails covering the silicon islands with a thick oxide layer, applying a protective photoresist layer over the thick oxide layer, and exposing the photoresist layer from the underside of the sapphire substrate thereby using the island as an exposure mask. Only the photoresist on the islands' edges will be exposed. The exposed photoresist is then removed and the thick oxide is removed from the islands edges which are then implanted.

AIS/DOE Technology Roadmap Program: Strip Casting: Anticipating New Routes To Steel Sheet

DOE Office of Scientific and Technical Information (OSTI.GOV)

Prof. Alan W. Camb; Prof. Anthony Rollett

2001-08-31

To determine the potential for strip casting in the steel industry and to develop the fundamental knowledge necessary to allow the role of strip casting in the modern steel industry to be understood. Based upon a study of carbon steel strip castings that were either produced for the program at British Steel or were received from a pre-commercial production machine, the following conclusions were made. Strip casting of carbon steels is technically feasible for sheet material from slightly less than 1 mm thick to 3 mm thick, and, assuming that it is economically viable, it will be first applied inmore » carbon steel markets that do not require stringent surface quality or extensive forming. The potential of strip casting as a casting process to be developed for steel castings is very high as the cast strip has some very novel characteristics. Direct cast carbon strip has better surface quality, shape and profile than any other casting process currently available. The more rapidly solidified structure of direct cast strip tends to be strong with low ductility; however, with adequate thermal treatment, it is possible to develop a variety of properties from the same grade. The process is more amenable at this time to production tonnages per year of the order of 500,000 tons and as such will first find niche type applications. This technology is an additional technology for steel production and will be in addition to, rather than a replacement for, current casting machines.« less

Introduction to Photolithography: Preparation of Microscale Polymer Silhouettes

ERIC Educational Resources Information Center

Berkowski, Kimberly L.; Plunkett, Kyle N.; Moore, Jeffrey S.

2005-01-01

A study describes an easy procedure based on a negative photoresist process designed for junior high or high school students, which will introduce them to the key terms and concepts of photolithography. The experiment allows students to visualize the fundamental process behind microchip fabrication, observe the rapid prototyping enabled by such a…

Photoresist laminate

DOEpatents

Andrade, A.D.; Galbraith, L.K.

1979-10-01

The disclosure relates to a laminated negative dry-film photoresist for the production of thick, as well as thin, patterns with vertical sidewalls. Uniform depthwise exposure in a photoresist layer is effected by the use of an ultraviolet filtering top layer.

Chemically amplified i-line positive resist for next-generation flat panel display

NASA Astrophysics Data System (ADS)

Lee, Hsing-Chieh; Lu, Ying-Hao; Huang, Shin-Yih; Lan, Wei-Jen; Hanabata, Makoto

2017-03-01

Traditional diazonaphthoquinone (DNQ) positive photoresists are widely used for TFT-LCD array process. Current LTPS technology has more than 600ppi resolution is required for small or middle-sized TFT liquid crystal display panels. One of the ways to enhance resolution is to apply i-line single exposure system instead of traditional g/h/ibroadband exposure system. We have been developing i-line chemically amplified photoresist ECA 200 series for the next generation flat panel display (FPD). ECA 200 consists of three components: a phenol resin, a photo acid generator and dissolution enhancer. We applied two different types of dissolution enhancers with two different kinds of protected groups to our resist materials. As a result, we achieved higher sensitivity, higher resolution, less footing of the resist profile and reduced standing wave effect compared with traditional DNQ photoresists. In addition, we have found further property of photoresist that does not need post exposure bake (PEB) process. This resist has a great advantage at most of current panel plants without PEB process.

Comparison of different photoresist buffer layers in SPR sensors based on D-shaped POF and gold film

NASA Astrophysics Data System (ADS)

Cennamo, Nunzio; Pesavento, Maria; De Maria, Letizia; Galatus, Ramona; Mattiello, Francesco; Zeni, Luigi

2017-04-01

A comparative analysis of two optical fiber sensing platforms is presented. The sensors are based on surface plasmon resonance (SPR) in a D-shaped plastic optical fiber (POF) with a photoresist buffer layer between the exposed POF core and the thin gold film. We show how the sensor's performances change when the photoresist layer changes. The photoresist layers proposed in this analysis are SU-8 3005 and S1813. The experimental results are congruent with the numerical studies and it is instrumental for chemical and bio-chemical applications. Usually, the photoresist layer is required in order to increase the performance of the SPR-POF sensor.

Star tracking reticles

NASA Technical Reports Server (NTRS)

Smith, W. O.; Toft, A. R. (Inventor)

1973-01-01

A method for the production of reticles, particularly those for use in outer space, where the product is a quartz base coated with highly adherent layers of chromium, chromium-silver, and silver vacuum deposited through a mask, and then coated with an electrodeposit of copper from a copper sulfate solution followed by an electrodeposit of black chromium is described. The masks are produced by coating a beryllium-copper alloy substrate with a positive working photoresist, developing the photoresist, according to a pattern to leave a positive mask, plating uncoated areas with gold, removing the photoresist, coating the substrate with a negative working photoresist, developing the negative working photoresist to expose the base metal of the pattern, and chemically etching the unplated side of the pattern to produce the mask.

Experimental, theoretical, and device application development of nanoscale focused electron-beam-induced deposition

NASA Astrophysics Data System (ADS)

Randolph, Steven Jeffrey

Electron-beam-induced deposition (EBID) is a highly versatile nanofabrication technique that allows for growth of a variety of materials with nanoscale precision and resolution. While several applications and studies of EBID have been reported and published, there is still a significant lack of understanding of the complex mechanisms involved in the process. Consequently, EBID process control is, in general, limited and certain common experimental results regarding nanofiber growth have yet to be fully explained. Such anomalous results have been addressed in this work both experimentally and by computer simulation. Specifically, a correlation between SiOx nanofiber deposition observations and the phenomenon of electron beam heating (EBH) was shown by comparison of thermal computer models and experimental results. Depending on the beam energy, beam current, and nanostructure geometry, the heat generated can be substantial and may influence the deposition rate. Temperature dependent EBID growth experiments qualitatively verified the results of the EBH model. Additionally, EBID was used to produce surface image layers for maskless, direct-write lithography (MDL). A single layer process used directly written SiOx features as a masking layer for amorphous silicon thin films. A bilayer process implemented a secondary masking layer consisting of standard photoresist into which a pattern---directly written by EBID tungsten---was transferred. The single layer process was found to be extremely sensitive to the etch selectivity of the plasma etch. In the bilayer process, EBID tungsten was written onto photoresist and the pattern transferred by means of oxygen plasma dry development following a brief refractory descum. Conditions were developed to reduce the spatial spread of electrons in the photoresist layer and obtain ˜ 35 nm lines. Finally, an EBID-based technique for field emitter repair was applied to the Digital Electrostatically focused e-beam Array Lithography (DEAL) parallel electron beam lithography configuration to repair damaged or missing carbon nanofiber cathodes. The I-V response and lithography results from EBID tungsten-based devices were comparable to CNF-based DEAL devices indicating a successful repair technique.

Lithographically patterned electrodeposition of gold, silver, and nickel nanoring arrays with widely tunable near-infrared plasmonic resonances.

PubMed

Halpern, Aaron R; Corn, Robert M

2013-02-26

A novel low-cost nanoring array fabrication method that combines the process of lithographically patterned nanoscale electrodeposition (LPNE) with colloidal lithography is described. Nanoring array fabrication was accomplished in three steps: (i) a thin (70 nm) sacrificial nickel or silver film was first vapor-deposited onto a plasma-etched packed colloidal monolayer; (ii) the polymer colloids were removed from the surface, a thin film of positive photoresist was applied, and a backside exposure of the photoresist was used to create a nanohole electrode array; (iii) this array of nanoscale cylindrical electrodes was then used for the electrodeposition of gold, silver, or nickel nanorings. Removal of the photoresist and sacrificial metal film yielded a nanoring array in which all of the nanoring dimensions were set independently: the inter-ring spacing was fixed by the colloidal radius, the radius of the nanorings was controlled by the plasma etching process, and the width of the nanorings was controlled by the electrodeposition process. A combination of scanning electron microscopy (SEM) measurements and Fourier transform near-infrared (FT-NIR) absorption spectroscopy were used to characterize the nanoring arrays. Nanoring arrays with radii from 200 to 400 nm exhibited a single strong NIR plasmonic resonance with an absorption maximum wavelength that varied linearly from 1.25 to 3.33 μm as predicted by a simple standing wave model linear antenna theory. This simple yet versatile nanoring array fabrication method was also used to electrodeposit concentric double gold nanoring arrays that exhibited multiple NIR plasmonic resonances.

Qualification of submerged-arc narrow strip cladding process

DOE Office of Scientific and Technical Information (OSTI.GOV)

Ayres, P.S.; Gottschling, J.D.; Jeffers, G.K.

1975-08-01

An unique narrow strip cladding process for use on both plate and forging material for nuclear components was developed. The qualification testing of this low-heat input process for cladding nuclear components, including those of SA508 Class 2 material is described. The theory that explains the acceptable results of these tests is also given. (auth)

Fabrication of submicron metallic grids with interference and phase-mask holography

DOE Office of Scientific and Technical Information (OSTI.GOV)

Park, Joong-Mok; Kim, Tae-Geun; Constant, Kristen

2011-01-25

Complex, submicron Cu metallic mesh nanostructures are made by electrochemical deposition using polymer templates made from photoresist. The polymer templates are fabricated with photoresist using two-beam interference holography and phase mask holography with three diffracted beams. Freestanding metallic mesh structures are made in two separate electrodepositions with perpendicular photoresist grating templates. Cu mesh square nanostructures having large (52.6%) open areas are also made by single electrodeposition with a photoresist template made with a phase mask. These structures have potential as electrodes in photonic devices.

AISI/DOE Advanced Process Control Program Vol. 3 of 6 Microstructure Engineering in Hot Strip Mills, Part 1 of 2: Integrated Mathematical Model

DOE Office of Scientific and Technical Information (OSTI.GOV)

J.K. Brimacombe; I.V. Samarasekera; E.B. Hawbolt

1999-07-31

This report describes the work of developing an integrated model used to predict the thermal history, deformation, roll forces, microstructural evolution and mechanical properties of steel strip in a hot-strip mill. This achievement results from a joint research effort that is part of the American Iron and Steel Institute's (AIS) Advanced Process Control Program, a collaboration between the U.S. DOE and fifteen North American Steelmakers.

Qualification of submerged-arc narrow strip cladding process

DOE Office of Scientific and Technical Information (OSTI.GOV)

Ayres, P.S.; Gottschling, J.D.; Jeffers, G.K.

1976-03-01

Babcock and Wilcox has developed an unique narrow strip cladding process for use on both plate and forging material for nuclear components. The qualification testing of this low-heat input process for cladding nuclear components is described, including those of SA508 Class 2 material. The theory that explains the acceptable results of these tests is also given.

Photoresist substrate having robust adhesion

DOEpatents

Dentinger, Paul M [Sunol, CA

2005-07-26

A substrate material for LIGA applications w hose general composition is Ti/Cu/Ti/SiO.sub.2. The SiO.sub.2 is preferably applied to the Ti/Cu/Ti wafer as a sputtered coating, typically about 100 nm thick. This substrate composition provides improved adhesion for epoxy-based photoresist materials, and particularly the photoresist material SU-8.

Using a micro-molding process to fabricate polymeric wavelength filters

NASA Astrophysics Data System (ADS)

Chuang, Wei-Ching; Lee, An-Chen; Ho, Chi-Ting

2008-08-01

A procedure for fabricating a high aspect ratio periodic structure on a UV polymer at submicron order using holographic interferometry and molding processes is described. First, holographic interferometry using a He-Cd (325 nm) laser was used to create the master of the periodic line structure on an i-line sub-micron positive photoresist film. A 20 nm nickel thin film was then sputtered on the photoresist. The final line pattern on a UV polymer was obtained from casting against the master mold. Finally, a SU8 polymer was spun on the polymer grating to form a planar waveguide or a channel waveguide. The measurement results show that the waveguide length could be reduced for the waveguide having gratings with a high aspect ratio.

Composition and method for removing photoresist materials from electronic components

DOEpatents

Davenhall, Leisa B [Santa Fe, NM; Rubin, James B [Los Alamos, NM; Taylor, Craig M. V. [Jemez Springs, NM

2008-06-03

Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate.

Method of Preparation AZP4330 PR Pattern with Edge Slope 40°

NASA Astrophysics Data System (ADS)

Wu, Jie; Zhao, Hongyuan; Yu, Yuanwei; Zhu, Jian

2018-03-01

When the edge which is under the multi-film is more steep or angular, the stress in the multilayer film near the edge is concentrated, this situation will greatly reduce the reliability of electronic components. And sometimes, we need some special structure such as a slope with a specific angle in the MEMS, so that the metal line can take the signal to the output pad through the slope instead of deep step. To cover these problems, the lithography method of preparing the structure with edge slope is studied. In this paper, based on the Kirchhoff scalar diffraction theory we try to change the contact exposure gap and the post-baking time at the specific temperature to find out the effect about the edge angle of the photoresist. After test by SEM, the results were presented by using AZP4330 photoresist, we can get the PR Pattern with edge slope 40° of the process and the specific process parameters.

Composition and method for removing photoresist materials from electronic components

DOEpatents

Davenhall, Leisa B.; Rubin, James B.; Taylor, Craig M.

2005-01-25

Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate.

Greyscale Photolithography for Multilayer PZT Microelectromechanical Systems (MEMS) Device Applications

DTIC Science & Technology

We present development of a process to perform greyscale photolithography on a 2.55-m thick photoresist in order to transfer tiered and sloped...platinum or iridium oxide (IrO2) electrodes above and below each layer. Process variables including resist rehydration , focus of the exposure, and UV cure...bake temperature were optimized to produce the best greyscale profile through the thickness of the resist.

100-nm gate lithography for double-gate transistors

NASA Astrophysics Data System (ADS)

Krasnoperova, Azalia A.; Zhang, Ying; Babich, Inna V.; Treichler, John; Yoon, Jung H.; Guarini, Kathryn; Solomon, Paul M.

2001-09-01

The double gate field effect transistor (FET) is an exploratory device that promises certain performance advantages compared to traditional CMOS FETs. It can be scaled down further than the traditional devices because of the greater electrostatic control by the gates on the channel (about twice as short a channel length for the same gate oxide thickness), has steeper sub-threshold slope and about double the current for the same width. This paper presents lithographic results for double gate FET's developed at IBM's T. J. Watson Research Center. The device is built on bonded wafers with top and bottom gates self-aligned to each other. The channel is sandwiched between the top and bottom polysilicon gates and the gate length is defined using DUV lithography. An alternating phase shift mask was used to pattern gates with critical dimensions of 75 nm, 100 nm and 125 nm in photoresist. 50 nm gates in photoresist have also been patterned by 20% over-exposure of nominal 100 nm lines. No trim mask was needed because of a specific way the device was laid out. UV110 photoresist from Shipley on AR-3 antireflective layer were used. Process windows, developed and etched patterns are presented.

Measurement of the residual stress in hot rolled strip using strain gauge method

NASA Astrophysics Data System (ADS)

Kumar, Lokendra; Majumdar, Shrabani; Sahu, Raj Kumar

2017-07-01

Measurement of the surface residual stress in a flat hot rolled steel strip using strain gauge method is considered in this paper. Residual stresses arise in the flat strips when the shear cut and laser cut is applied. Bending, twisting, central buckled and edge waviness is the common defects occur during the cutting and uncoiling process. These defects arise due to the non-uniform elastic-plastic deformation, phase transformation occurring during cooling and coiling-uncoiling process. The residual stress analysis is very important because with early detection it is possible to prevent an object from failure. The goal of this paper is to measure the surface residual stress in flat hot rolled strip using strain gauge method. The residual stress was measured in the head and tail end of hot rolled strip considering as a critical part of the strip.

EUV patterning using CAR or MOX photoresist at low dose exposure for sub 36nm pitch

NASA Astrophysics Data System (ADS)

Thibaut, Sophie; Raley, Angélique; Lazarrino, Frederic; Mao, Ming; De Simone, Danilo; Piumi, Daniele; Barla, Kathy; Ko, Akiteru; Metz, Andrew; Kumar, Kaushik; Biolsi, Peter

2018-04-01

The semiconductor industry has been pushing the limits of scalability by combining 193nm immersion lithography with multi-patterning techniques for several years. Those integrations have been declined in a wide variety of options to lower their cost but retain their inherent variability and process complexity. EUV lithography offers a much desired path that allows for direct print of line and space at 36nm pitch and below and effectively addresses issues like cycle time, intra-level overlay and mask count costs associated with multi-patterning. However it also brings its own sets of challenges. One of the major barrier to high volume manufacturing implementation has been hitting the 250W power exposure required for adequate throughput [1]. Enabling patterning using a lower dose resist could help move us closer to the HVM throughput targets assuming required performance for roughness and pattern transfer can be met. As plasma etching is known to reduce line edge roughness on 193nm lithography printed features [2], we investigate in this paper the level of roughness that can be achieved on EUV photoresist exposed at a lower dose through etch process optimization into a typical back end of line film stack. We will study 16nm lines printed at 32 and 34nm pitch. MOX and CAR photoresist performance will be compared. We will review step by step etch chemistry development to reach adequate selectivity and roughness reduction to successfully pattern the target layer.

Specific features of single-pulse femtosecond laser micron and submicron ablation of a thin silver film coated with a micron-thick photoresist layer

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zayarnyi, D A; Ionin, A A; Kudryashov, S I

Specific features of ablation of a thin silver film with a 1-μm-thick layer of a highly transparent photoresist and the same film without a photoresist layer under single tightly focused femtosecond laser pulses in the visible range (515 nm) are experimentally investigated. Interference effects of internal modification of the photoresist layer, its spallation ablation from the film surface and formation of through hollow submicron channels in the resist without its spallation but with ablation of the silver film lying under the resist are found and discussed. (extreme light fields and their applications)

Microwave performance of photoresist-alumina microcomposites for batch fabrication of thick polymer-based dielectric structures

NASA Astrophysics Data System (ADS)

Rashidian, Atabak; Klymyshyn, David M.; Tayfeh Aligodarz, Mohammadreza; Boerner, Martin; Mohr, Jürgen

2012-10-01

The goal of this paper is to investigate the electrical properties of photoresist-alumina microcomposites with different portions of ceramic content. Substrates of photoresist-alumina microcomposites are fabricated and a comprehensive analysis is performed to characterize their dielectric constant and dielectric loss tangent at microwave frequencies up to 40 GHz. To evaluate the performance of these materials for microwave applications, the properties of various lithographically fabricated antenna elements are examined and analysed based on the measured electrical properties. The experimental results show that the electrical properties of the photoresist composite are nonlinearly affected by ceramic content and also a minimum percentage of ceramic portion is required to improve the electrical properties of the photoresist composite. For instance, comparison of 0 wt% with 23 wt% SU8-alumina shows that no reduction is achieved for the dielectric loss tangent. Comparison of 38 wt% with 48 wt% SU8-alumina microcomposite shows that the dielectric loss tangent is improved from 0.03 to 0.01 and the dielectric constant is increased from 3.8 to 5.0 at 25 GHz. These improvements can result in superior performance for the photoresist-based microwave components.

Design and fabrication of directional diffractive device on glass substrate for multiview holographic 3D display

NASA Astrophysics Data System (ADS)

Su, Yanfeng; Cai, Zhijian; Liu, Quan; Zou, Wenlong; Guo, Peiliang; Wu, Jianhong

2018-01-01

Multiview holographic 3D display based on the nano-grating patterned directional diffractive device can provide 3D images with high resolution and wide viewing angle, which has attracted considerable attention. However, the current directional diffractive device fabricated on the photoresist is vulnerable to damage, which will lead to the short service life of the device. In this paper, we propose a directional diffractive device on glass substrate to increase its service life. In the design process, the period and the orientation of the nano-grating at each pixel are carefully calculated accordingly by the predefined position of the viewing zone, and the groove parameters are designed by analyzing the diffraction efficiency of the nano-grating pixel on glass substrate. In the experiment, a 4-view photoresist directional diffractive device with a full coverage of pixelated nano-grating arrays is efficiently fabricated by using an ultraviolet continuously variable spatial frequency lithography system, and then the nano-grating patterns on the photoresist are transferred to the glass substrate by combining the ion beam etching and the reactive ion beam etching for controlling the groove parameters precisely. The properties of the etched glass device are measured under the illumination of a collimated laser beam with a wavelength of 532nm. The experimental results demonstrate that the light utilization efficiency is improved and optimized in comparison with the photoresist device. Furthermore, the fabricated device on glass substrate is easier to be replicated and of better durability and practicability, which shows great potential in the commercial applications of 3D display terminal.

A model for prediction of profile and flatness of hot and cold rolled flat products in four-high mills

NASA Astrophysics Data System (ADS)

Overhagen, Christian; Mauk, Paul Josef

2018-05-01

For flat rolled products, the thickness profile in the transversal direction is one of the most important product properties. For further processing, a defined crown of the product is necessary. In the rolling process, several mechanical and thermal influences interact with each other to form the strip shape at the roll gap exit. In the present analysis, a process model for rolling of strip and sheet is presented. The core feature of the process model is a two-dimensional stress distribution model based on von Karman's differential equation. Sub models for the mechanical influences of work roll flattening as well as work and backup roll deflection and the thermal influence of work roll expansion have been developed or extended. The two-dimensional stress distribution serves as an input parameter for the roll deformation models. For work roll flattening, a three-dimensional model based on the Boussinesq problem is adopted, while the work and backup roll deflection, including contact flattening is calculated by means of finite beam elements. The thermal work roll crown is calculated with help of an axisymmetric numerical solution of the heat equation for the work roll, considering azimuthal averaging for the boundary conditions at the work roll surface. Results are presented for hot rolling of a strip in a seven-stand finishing train of a hot strip mill, showing the calculated evolution of the strip profile. A variation of the strip profile from the first to the 20th rolled strip is shown. This variation is addressed to the progressive increase of work roll temperature during the first 20 strips. It is shown that a CVC® system can lead to improvements in strip profile and therefore flatness.

Study on the wiping gas jet in continuous galvanizing line

NASA Astrophysics Data System (ADS)

Kweon, Yong-Hun; Kim, Heuy-Dong

2011-09-01

In the continuous hot-dip galvanizing process, the gas-jet wiping is used to control the coating thickness of moving steel strip. The high speed gas-jet discharged from the nozzle slot impinges on the strip, and at this moment, wipes the liquid coating layer dragged by a moving strip. The coating thickness is generally influenced on the flow characteristics of wiping gas-jet such as the impinging pressure distribution, pressure gradient and shear stress distribution on the surface of strip. The flow characteristics of wiping gas-jet mentioned above depends upon considerably both the process operating conditions such as the nozzle pressure, nozzle-to-strip distance and line speed, and the geometry of gas-jet wiping apparatus such as the height of nozzle slot. In the present study, the effect of the geometry of nozzle on the coating thickness is investigated with the help of a computational fluid dynamics method. The height of nozzle slot is varied in the range of 0.6mm to 1.7mm. A finite volume method (FVM) is employed to solve two-dimensional, steady, compressible Navier-Stokes equations. Based upon the results obtained, the effect of the height of nozzle slot in the gas-jet wiping process is discussed in detail. The computational results show that for a given standoff distance between the nozzle to the strip, the effective height of nozzle slot exists in achieving thinner coating thickness.

Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists

DOE Office of Scientific and Technical Information (OSTI.GOV)

Renschler, C.L.

1988-10-17

Photoresist techniques and compositions are provided employing curcumin as an absorptive dye for the purpose of reducing linewidth non-uniformity caused by scattered and reflective light from the substrate-resist interface. The photoresist compositions containing curcumin as the absorptive dye are used in the production of microelectronic circuitry by both single layer and multilayer photoresist techniques. 2 figs.

Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists

DOEpatents

Renschler, C.L.

1986-11-25

Photoresist techniques and compositions are provided employing curcumin as an absorptive dye for the purpose of reducing linewidth non-uniformity caused by scattered and reflective light from the substrate-resist interface. The photoresist compositions containing curcumin as the absorptive dye are used in the production of microelectronic circuitry by both single layer and multilayer photoresist techniques.

A low-cost, high-yield fabrication method for producing optimized biomimetic dry adhesives

NASA Astrophysics Data System (ADS)

Sameoto, D.; Menon, C.

2009-11-01

We present a low-cost, large-scale method of fabricating biomimetic dry adhesives. This process is useful because it uses all photosensitive polymers with minimum fabrication costs or complexity to produce molds for silicone-based dry adhesives. A thick-film lift-off process is used to define molds using AZ 9260 photoresist, with a slow acting, deep UV sensitive material, PMGI, used as both an adhesion promoter for the AZ 9260 photoresist and as an undercutting material to produce mushroom-shaped fibers. The benefits to this process are ease of fabrication, wide range of potential layer thicknesses, no special surface treatment requirements to demold silicone adhesives and easy stripping of the full mold if process failure does occur. Sylgard® 184 silicone is used to cast full sheets of biomimetic dry adhesives off 4" diameter wafers, and different fiber geometries are tested for normal adhesion properties. Additionally, failure modes of the adhesive during fabrication are noted and strategies for avoiding these failures are discussed. We use this fabrication method to produce different fiber geometries with varying cap diameters and test them for normal adhesion strengths. The results indicate that the cap diameters relative to post diameters for mushroom-shaped fibers dominate the adhesion properties.

Non-ARC solution to metal reflective notching: its evaluation and selection

NASA Astrophysics Data System (ADS)

Buffat, Stephen J.

1997-07-01

Patterning photoresists on reflective topography such as aluminum is one of the more difficult problems in device manufacturing. Interference effects caused by reflected light from the substrate/photoresist interface and surface topography result in coupling of additional energy into the film. This leads to linewidth variation known as reflective notching which severely impacts process latitude and increases critical dimension variation. For many years, suppliers approached the problem by adding dyes that absorb in the actinic region to create a larger non-bleachable absorption. In recent years, strongly absorbing intermediate layers or ARC's, both organic and inorganic, have seen widespread implementation to control reflective notching. However, if a fab is not equipped to accommodate the required ARC process, the processing can be very time consuming, cumbersome and costly. This study was undertaken to determine if a non-ARC, i-line photoresist process could be developed to reduce or eliminate aluminum reflective notching and accompanying critical dimension variation. This study was designed to screen, identify, and characterize various resist chemistries. Based on the screening characterization, a final, cost effective resist chemistry without ARC was selected, fully characterized and transferred into production. The selected material is currently being used in a high volume 0.60 micrometers CMOS, 200 mm wafer manufacturing process.

Process for protecting bonded components from plating shorts

DOEpatents

Tarte, Lisa A.; Bonde, Wayne L.; Carey, Paul G.; Contolini, Robert J.; McCarthy, Anthony M.

2000-01-01

A method which protects the region between a component and the substrate onto which the components is bonded using an electrically insulating fillet of photoresist. The fillet protects the regions from subsequent plating with metal and therefore shorting the plated conductors which run down the sides of the component and onto the substrate.

Adaptive wettability-enhanced surfaces ordered on molded etched substrates using shrink film

NASA Astrophysics Data System (ADS)

Jayadev, Shreshta; Pegan, Jonathan; Dyer, David; McLane, Jolie; Lim, Jessica; Khine, Michelle

2013-01-01

Superhydrophobic surfaces in nature exhibit desirable properties including self-cleaning, bacterial resistance, and flight efficiency. However, creating such intricate multi-scale features with conventional fabrication approaches is difficult, expensive, and not scalable. By patterning photoresist on pre-stressed shrink-wrap film, which contracts by 95% in surface area when heated, such features over large areas can be obtained easily. Photoresist serves as a dry etch mask to create complex and high-aspect ratio microstructures in the film. Using a double-shrink process, we introduce adaptive wettability-enhanced surfaces ordered on molded etched (AWESOME) substrates. We first create a mask out of the children’s toy ‘Shrinky-Dinks’ by printing dots using a laserjet printer. Heating this thermoplastic sheet causes the printed dots to shrink to a fraction of their original size. We then lithographically transfer the inverse pattern onto photoresist-coated shrink-wrap polyolefin film. The film is then plasma etched. After shrinking, the film serves as a high-aspect ratio mold for polydimethylsiloxane, creating a superhydrophobic surface with water contact angles >150° and sliding angles <10°. We pattern a microarray of ‘sticky’ spots with a dramatically different sliding angle compared to that of the superhydrophobic region, enabling microtiter-plate type assays without the need for a well plate.

Photosensitive dissolution inhibitors and resists based on onium salt carboxylates

DOEpatents

Dentinger, Paul M.; Simison, Kelby L.

2005-11-29

A photoresist composition that employs onium salt carboxylates as thermally stable dissolution inhibitors. The photoresist composition can be either an onium carboxylate salt with a phenolic photoresist, such as novolac, or an onium cation protected carboxylate-containing resin such as an acrylic/acrylic acid copolymer. The onium carboxylate can be an onium cholate, wherein the onium cholate is an iodonium cholate. Particularly preferred iodonium cholates are alkyloxyphenylphenyl iodonium cholates and most particularly preferred is octyloxyphenyphenyl iodonium cholate. The photoresist composition will not create nitrogen or other gaseous byproducts upon exposure to radiation, does not require water for photoactivation, has acceptable UV radiation transmission characteristics, and is thermally stable at temperatures required for solvent removal.

The effect of materials selection on metals reduction in propylene glycol methyl ether acetate, PGMEA

NASA Astrophysics Data System (ADS)

Entezarian, Majid; Geiger, Bob

2016-03-01

The trend in microelectronics fabrication is to produce nano-features measuring down to 10 nm and finer. The PPT levels of organic and inorganic contaminants in the photoresist, solvent and cleaning solutions are becoming a major processing variable affecting the process capability and defectivity. The photoresist usually contains gels, metals, and particulates that could interfere with the lithography process and cause microbridging defects. Nano filters of 5 nm polypropylene, 5 nm polyethylene, and 10 nm natural nylon were used to filter propylene glycol methyl ether acetate PGMEA containing 50 ppb of Na, Mg, Al, Ca, Cr, Mn, Fe, Cu, Zn, and Pb. All filters were effective in removing trivalent Al, Cr, and Fe metals indicating the mechanism for their removal as mechanical sieving. However, the nylon was also very effective in removing the divalent metals showing adsorptive properties. Furthermore, the metal removal of the nylon membrane was studied as a function of surface chemistry. Natural and charged 40 nm nylon membranes were tested and found that charged nylon is more effective for metal removal.

Controlling the Electrochemically Active Area of Carbon Fiber Microelectrodes by the Electrodeposition and Selective Removal of an Insulating Photoresist

PubMed Central

Lambie, Bradley A.; Orwar, Owe; Weber, Stephen G.

2008-01-01

A new and simple method permits control of the electrochemically active area of a carbon fiber microelectrode. An electrophoretic photoresist insulates the 10 μm diameter carbon fiber microelectrodes. Photolysis of the photoresist followed by immersion of the exposed area into a developing solution reveals electroactive carbon fiber surface. The electroactive surface area exposed can be controlled with a good degree of reproducibility. PMID:16841943

Reinforced Masks for Ion Plating of Solar Cells

NASA Technical Reports Server (NTRS)

Conley, W. R.; Swick, E. G.; Volkers, J. C.

1987-01-01

Proposed mask for ion plating of surface electrodes on silicon solar cells reinforced to hold shape better during handling. Fabrication process for improved mask similar to conventional mask. Additional cuts and bends made in wide diametral strip to form bridges between pairs of mask fingers facing each other across this strip. Bridges high enough not to act as masks so entire strip area plated.

Microstructure fabrication process induced modulations in CVD graphene

DOE Office of Scientific and Technical Information (OSTI.GOV)

Matsubayashi, Akitomo, E-mail: amatsubayashi@albany.edu; Zhang, Zhenjun; Lee, Ji Ung

The systematic Raman spectroscopic study of a “mimicked” graphene device fabrication is presented. Upon photoresist baking, compressive stress is induced in the graphene which disappears after it is removed. The indirect irradiation from the electron beam (through the photoresist) does not significantly alter graphene characteristic Raman peaks indicating that graphene quality is preserved upon the exposure. The 2D peak shifts and the intensity ratio of 2D and G band, I(2D)/I(G), decreases upon direct metal deposition (Co and Py) suggesting that the electronic modulation occurs due to sp{sup 2} C-C bond weakening. In contrast, a thin metal oxide film deposited graphenemore » does not show either the significant 2D and G peaks shift or I(2D)/I(G) decrease upon the metal deposition suggesting the oxide protect the graphene quality in the fabrication process.« less

Distributed Feedback Laser Based on Single Crystal Perovskite

NASA Astrophysics Data System (ADS)

Sun, Shang; Xiao, Shumin; Song, Qinghai

2017-06-01

We demonstrate a single crystal perovskite based, with grating-structured photoresist on top, highly polarized distributed feedback laser. A lower laser threshold than the Fabry-Perot mode lasers from the same single crystal CH3NH3PbBr3 microplate was obtained. Single crystal CH3NH3PbBr3 microplates was synthesized with one-step solution processed precipitation method. Once the photoresist on top of the microplate was patterned with electron beam, the device was realized. This one-step fabrication process utilized the advantage of single crystal to the greatest extend. The ultra-low defect density in single crystalline microplate offer an opportunity for lower threshold lasing action compare with poly-crystal perovskite films. In the experiment, the lasing action based on the distributed feedback grating design was found with lower threshold and higher intensity than the Fabry-Perot mode lasers supported by the flat facets of the same microplate.

Numerical and experimental investigation of strip deformation in cage roll forming process for pipes with low ratio of thickness/diameter

NASA Astrophysics Data System (ADS)

Kasaei, M. M.; Naeini, H. Moslemi; Tehrani, M. Salmani; Tafti, R. Azizi

2011-01-01

Cage roll forming is one of the advanced methods of cold roll forming process which is used widely for producing ERW pipes. In addition to decreasing the production cost and time, using cage roll forming provides smooth deformation on the strip. Few studies can be found about cage roll forming because of its complexity, and the available knowledge is experience-based more than science-based. In this paper, deformation of pipes with low ratio of thickness/diameter is investigated by 3D finite element simulation in Marc-Mentat software. Edge buckling defect in cage roll forming of low ratio of thickness/diameter pipes is very important. Due to direct influence of longitudinal strain on the edge buckling phenomenon, longitudinal strains at the edge and center line of the strip are investigated and high risk stands are introduced. The deformed strip is predicted using the simulation results and effects of each cage forming stage on the deformed strip profile are specified. In order to verify the simulation results, strip width and opening distance of the two edges in different forming stages are obtained from the simulations and compared with the experimental data which were measured from the production line. A good agreement between the experimental and simulated results is observed.

Using an SU-8 photoresist structure and cytochrome C thin film sensing material for a microbolometer.

PubMed

Lai, Jian-Lun; Liao, Chien-Jen; Su, Guo-Dung John

2012-11-27

There are two critical parameters for microbolometers: the temperature coefficient of resistance (TCR) of the sensing material, and the thermal conductance of the insulation structure. Cytochrome c protein, having a high TCR, is a good candidate for infrared detection. We can use SU-8 photoresist for the thermal insulation structure, given its low thermal conductance. In this study, we designed a platform structure based on a SU-8 photoresist. We fabricated an infrared sensing pixel and recorded a high TCR for this new structure. The SU-8 photoresist insulation structure was fabricated using the exposure dose method. We experimentally demonstrated high values of TCR from 22%/K to 25.7%/K, and the measured noise was 1.2 × 10(-8) V2/Hz at 60 Hz. When the bias current was 2 μA, the calculated voltage responsivity was 1.16 × 10(5) V/W. This study presents a new kind of microbolometer based on cytochrome c protein on top of an SU-8 photoresist platform that does not require expensive vacuum deposition equipment.

Using an SU-8 Photoresist Structure and Cytochrome C Thin Film Sensing Material for a Microbolometer

PubMed Central

Lai, Jian-Lun; Liao, Chien-Jen; Su, Guo-Dung John

2012-01-01

There are two critical parameters for microbolometers: the temperature coefficient of resistance (TCR) of the sensing material, and the thermal conductance of the insulation structure. Cytochrome c protein, having a high TCR, is a good candidate for infrared detection. We can use SU-8 photoresist for the thermal insulation structure, given its low thermal conductance. In this study, we designed a platform structure based on a SU-8 photoresist. We fabricated an infrared sensing pixel and recorded a high TCR for this new structure. The SU-8 photoresist insulation structure was fabricated using the exposure dose method. We experimentally demonstrated high values of TCR from 22%/K to 25.7%/K, and the measured noise was 1.2 × 10−8 V2/Hz at 60 Hz. When the bias current was 2 μA, the calculated voltage responsivity was 1.16 × 105 V/W. This study presents a new kind of microbolometer based on cytochrome c protein on top of an SU-8 photoresist platform that does not require expensive vacuum deposition equipment. PMID:23443384

Study on thick film spin-on carbon hardmask

NASA Astrophysics Data System (ADS)

Kim, Taeho; Kim, Youngmin; Hwang, Sunmin; Lee, Hyunsoo; Han, Miyeon; Lim, Sanghak

2017-03-01

A thick spin-on carbon hardmask (SOH) material is designed to overcome inherent problems of amorphous deposited carbon layer (ACL) and thick photoresist. For ACL in use of semiconductor production process, especially when film thickness from sub-micrometer up to few micrometers is required, not only its inherent low transparency at long wavelength light often causes alignment problems with under layers, but also considerable variation of film thickness within a wafer can also cause patterning problems. To avoid these issues, a thick SOH is designed with monomers of high transparency and good solubility at the same time. In comparison with photoresist, the SOH has good etch resistance and high thermal stability, and it provides wide process window of decreased film thickness and increased thermal budget up to 400°C after processes such as high temperature deposition of SiON. In order to achieve high thickness along with uniform film, many solvent factors was considered such as solubility parameter, surface tension, vapor pressure, and others. By optimizing many solvent factors, we were able to develop a product with a good coating performance

Fabrication of a Silicon MOSFET Device with Bipolar Transistor Source,

DTIC Science & Technology

1980-07-01

NEGATIVE PHOTORESIST PROCEDURE ’•J n •:• fi >. 3 u i fc- Process Coat wafer Air dry Pre bake the resist coating Expose Develop Method Time...Orange (rather broad for orange) 0.82 Salmon 0.85 Dull, light red-violet 0.86 Violet £ 0.87 Blue-violet 0.89 Blue ::’ 0.92 V Blue-green •I 0.95

Microstructure Engineering in Hot Strip Mills, Part 1 of 2: Integrated mathematical Model

DOE Office of Scientific and Technical Information (OSTI.GOV)

J.K. Brimacombe; I.V. Samaraseker; E.B. Hawbolt

1998-09-30

This report describes the work of developing an integrated model used to predict the thermal history, deformation, roll forces, microstructural evaluation and mechanical properties of steel strip in a hot-strip mill. This achievement results from a join research effort that is part of the American Iron and Steel Institute's (AISI) Advanced Process Control Program, a collaboration between the U.S. DOE and fifteen North American steel makers.

New dual-curvature microlens array with a high fill-factor for organic light emitting diode modules

NASA Astrophysics Data System (ADS)

Lin, Tsung-Hung; Yang, Hsiharng; Chao, Ching-Kong; Shui, Hung-Chi

2013-09-01

A new method for fabricating a novel dual-curvature microlens array with a high fill-factor using proximity printing in a lithography process is reported. The lens shapes include dual-curvature, which is a novel shape composed of triangles and hexagons. We utilized UV proximity printing by controlling a printing gap between the mask and substrate. The designed high density microlens array pattern can fabricate a dual-curvature microlens array with a high fill-factor in a photoresist material. It is due to the UV light diffraction which deflects away from the aperture edges and produces a certain exposure in the photoresist material outside the aperture edges. A dual-curvature microlens array with a height ratio of 0.48 can boost axial luminance up to 22%. Therefore, the novel dual-curvature microlens array offers an economical solution for increasing the luminance of organic light emitting diodes.

The fabrication of diversiform nanostructure forests based on residue nanomasks synthesized by oxygen plasma removal of photoresist

NASA Astrophysics Data System (ADS)

Mao, Haiyang; Wu, Di; Wu, Wengang; Xu, Jun; Hao, Yilong

2009-11-01

A simple lithography-free approach for fabricating diversiform nanostructure forests is presented. The key technique of the approach is that randomly distributed nanoscale residues can be synthesized on substrates simply by removing photoresist with oxygen plasma bombardment. These nanoresidues can function as masks in the subsequent etching process for nanopillars. By further spacer and then deep etching processes, a variety of forests composed of regular, tulip-like or hollow-head nanopillars as well as nanoneedles are successfully achieved in different etching conditions. The pillars have diameters of 30-200 nm and heights of 400 nm-3 µm. The needles reach several microns in height, with their tips less than 10 nm in diameter. Moreover, microstructures containing these nanostructure forests, such as surface microchannels, have also been fabricated. This approach is compatible with conventional micro/nano-electromechanical system (MEMS/NEMS) fabrication.

Grayscale lithography-automated mask generation for complex three-dimensional topography

NASA Astrophysics Data System (ADS)

Loomis, James; Ratnayake, Dilan; McKenna, Curtis; Walsh, Kevin M.

2016-01-01

Grayscale lithography is a relatively underutilized technique that enables fabrication of three-dimensional (3-D) microstructures in photosensitive polymers (photoresists). By spatially modulating ultraviolet (UV) dosage during the writing process, one can vary the depth at which photoresist is developed. This means complex structures and bioinspired designs can readily be produced that would otherwise be cost prohibitive or too time intensive to fabricate. The main barrier to widespread grayscale implementation, however, stems from the laborious generation of mask files required to create complex surface topography. We present a process and associated software utility for automatically generating grayscale mask files from 3-D models created within industry-standard computer-aided design (CAD) suites. By shifting the microelectromechanical systems (MEMS) design onus to commonly used CAD programs ideal for complex surfacing, engineering professionals already familiar with traditional 3-D CAD software can readily utilize their pre-existing skills to make valuable contributions to the MEMS community. Our conversion process is demonstrated by prototyping several samples on a laser pattern generator-capital equipment already in use in many foundries. Finally, an empirical calibration technique is shown that compensates for nonlinear relationships between UV exposure intensity and photoresist development depth as well as a thermal reflow technique to help smooth microstructure surfaces.

Physical distribution of oak strip flooring 1969

Treesearch

William C. Miller; William C. Miller

1971-01-01

As an aid to the marketing of oak strip flooring, a study was made of the distribution process for this product, from manufacture to consumer-where the flooring came from, where it went, how much was shipped, and who handled it.

Rapid fabrication of a micro-ball lens array by extrusion for optical fiber applications.

PubMed

Shen, S C; Huang, J C

2009-07-20

Batch-fabrication of a micro-ball lens array (MBA) could not only reduce micro assembly costs but also replace conventional ball lenses or costly GRINs (Gradient Refractive Index) without compromising performance. Compared with conventional half-spherical micro-lenses, the MBA is a spherical micro-lens that can focus light in all directions, thus providing the flexibility required for optical applications. Current MBAs are made of SU-8 photoresist by an extrusion process rather than the traditional thermal reflow process. The aim of this study was to develop a new process for MBA batch-fabrication, performed at ambient temperature, by spin-coating SU-8 onto a silicon-wafer surface, which serves as an extrusion plate, and extruding it through a nozzle to form an MBA. The nozzle consists of a nozzle orifice and nozzle cavity, the former being defined and made from SU-8 photoresist using ultra-violet (UV) lithography, which results in good mechanical properties. In this paper, the fabrication of 4 x 4 MBAs with diameters ranging from 60 to 550 um is described. Optical measurements indicated a diameter variance within 3% and a maximum coupling efficiency of approximately 62% when the single mode fiber (SMF) was placed at a distance of 10 um from the MBA. The results of this study proved that MBA fabrication by the extrusion process can enhance the coupling efficiency.

Direct laser writing of polymeric nanostructures via optically induced local thermal effect

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tong, Quang Cong; Institute of Materials Science, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet, Cau Giay, 10000 Hanoi; Nguyen, Dam Thuy Trang

We demonstrate the fabrication of desired structures with feature size below the diffraction limit by use of a positive photoresist. The direct laser writing technique employing a continuous-wave laser was used to optically induce a local thermal effect in a positive photoresist, which then allowed the formation of solid nanostructures. This technique enabled us to realize multi-dimensional sub-microstructures by use of a positive photoresist, with a feature size down to 57 nm. This mechanism acting on positive photoresists opens a simple and low-cost way for nanofabrication.

Fabrication of polydimethylsiloxane (PDMS) - based multielectrode array for neural interface.

PubMed

Kim, Jun-Min; Oh, Da-Rong; Sanchez, Joaquin; Kim, Shang-Hyub; Seo, Jong-Mo

2013-01-01

Flexible multielectrode arrays (MEAs) are being developed with various materials, and polyimide has been widely used due to the conveniece of process. Polyimide is developed in the form of photoresist. And this enable precise and reproducible fabrication. PDMS is another good candidate for MEA base material, but it has poor surface energy and etching property. In this paper, we proposed a better fabrication process that could modify PDMS surface for a long time and open the site of electrode and pad efficiently without PDMS etching.

Investigation of HV/HR-CMOS technology for the ATLAS Phase-II Strip Tracker Upgrade

NASA Astrophysics Data System (ADS)

Fadeyev, V.; Galloway, Z.; Grabas, H.; Grillo, A. A.; Liang, Z.; Martinez-Mckinney, F.; Seiden, A.; Volk, J.; Affolder, A.; Buckland, M.; Meng, L.; Arndt, K.; Bortoletto, D.; Huffman, T.; John, J.; McMahon, S.; Nickerson, R.; Phillips, P.; Plackett, R.; Shipsey, I.; Vigani, L.; Bates, R.; Blue, A.; Buttar, C.; Kanisauskas, K.; Maneuski, D.; Benoit, M.; Di Bello, F.; Caragiulo, P.; Dragone, A.; Grenier, P.; Kenney, C.; Rubbo, F.; Segal, J.; Su, D.; Tamma, C.; Das, D.; Dopke, J.; Turchetta, R.; Wilson, F.; Worm, S.; Ehrler, F.; Peric, I.; Gregor, I. M.; Stanitzki, M.; Hoeferkamp, M.; Seidel, S.; Hommels, L. B. A.; Kramberger, G.; Mandić, I.; Mikuž, M.; Muenstermann, D.; Wang, R.; Zhang, J.; Warren, M.; Song, W.; Xiu, Q.; Zhu, H.

2016-09-01

ATLAS has formed strip CMOS project to study the use of CMOS MAPS devices as silicon strip sensors for the Phase-II Strip Tracker Upgrade. This choice of sensors promises several advantages over the conventional baseline design, such as better resolution, less material in the tracking volume, and faster construction speed. At the same time, many design features of the sensors are driven by the requirement of minimizing the impact on the rest of the detector. Hence the target devices feature long pixels which are grouped to form a virtual strip with binary-encoded z position. The key performance aspects are radiation hardness compatibility with HL-LHC environment, as well as extraction of the full hit position with full-reticle readout architecture. To date, several test chips have been submitted using two different CMOS technologies. The AMS 350 nm is a high voltage CMOS process (HV-CMOS), that features the sensor bias of up to 120 V. The TowerJazz 180 nm high resistivity CMOS process (HR-CMOS) uses a high resistivity epitaxial layer to provide the depletion region on top of the substrate. We have evaluated passive pixel performance, and charge collection projections. The results strongly support the radiation tolerance of these devices to radiation dose of the HL-LHC in the strip tracker region. We also describe design features for the next chip submission that are motivated by our technology evaluation.

Theoretical Investigation of the Interfacial Reactions during Hot-Dip Galvanizing of Steel

NASA Astrophysics Data System (ADS)

Mandal, G. K.; Balasubramaniam, R.; Mehrotra, S. P.

2009-03-01

In the modern galvanizing line, as soon as the steel strip enters the aluminum-containing zinc bath, two reactions occur at the strip and the liquid-zinc alloy interface: (1) iron rapidly dissolves from the strip surface, raising the iron concentration in the liquid phase at the strip-liquid interface; and (2) aluminum forms a stable aluminum-iron intermetallic compound layer at the strip-coating interface due to its greater affinity toward iron. The main objective of this study is to develop a simple and realistic mathematical model for better understanding of the kinetics of galvanizing reactions at the strip and the liquid-zinc alloy interface. In the present study, a model is proposed to simulate the effect of various process parameters on iron dissolution in the bath, as well as, aluminum-rich inhibition layer formation at the substrate-coating interface. The transient-temperature profile of the immersed strip is predicted based on conductive and convective heat-transfer mechanisms. The inhibition-layer thickness at the substrate-coating interface is predicted by assuming the cooling path of the immersed strip consists of a series of isothermal holds of infinitesimal time-step. The influence of galvanizing reaction is assessed by considering nucleation and growth mechanisms at each hold time, which is used to estimate the total effect of the immersion time on the formation mechanism of the inhibition layer. The iron- dissolution model is developed based on well established principles of diffusion taking into consideration the area fraction covered by the intermetallic on the strip surface during formation of the inhibition layer. The model can be effectively used to monitor the dross formation in the bath by optimizing the process parameters. Theoretical predictions are compared with the findings of other researchers. Simulated results are in good agreement with the theoretical and experimental observation carried out by other investigators.

Process For Patterning Dispenser-Cathode Surfaces

NASA Technical Reports Server (NTRS)

Garner, Charles E.; Deininger, William D.

1989-01-01

Several microfabrication techniques combined into process cutting slots 100 micrometer long and 1 to 5 micrometer wide into tungsten dispenser cathodes for traveling-wave tubes. Patterned photoresist serves as mask for etching underlying aluminum. Chemically-assisted ion-beam etching with chlorine removes exposed parts of aluminum layer. Etching with fluorine or chlorine trifluoride removes tungsten not masked by aluminum layer. Slots enable more-uniform low-work function coating dispensed to electron-emitting surface. Emission of electrons therefore becomes more uniform over cathode surface.

Thermally assisted peeling of an elastic strip in adhesion with a substrate via molecular bonds

NASA Astrophysics Data System (ADS)

Qian, Jin; Lin, Ji; Xu, Guang-Kui; Lin, Yuan; Gao, Huajian

A statistical model is proposed to describe the peeling of an elastic strip in adhesion with a flat substrate via an array of non-covalent molecular bonds. Under an imposed tensile peeling force, the interfacial bonds undergo diffusion-type transition in their bonding state, a process governed by a set of probabilistic equations coupled to the stretching, bending and shearing of the elastic strip. Because of the low characteristic energy scale associated with molecular bonding, thermal excitations are found to play an important role in assisting the escape of individual molecular bonds from their bonding energy well, leading to propagation of the peeling front well below the threshold peel-off force predicted by the classical theories. Our study establishes a link between the deformation of the strip and the spatiotemporal evolution of interfacial bonds, and delineates how factors like the peeling force, bending rigidity of the strip and binding energy of bonds influence the resultant peeling velocity and dimensions of the process zone. In terms of the apparent adhesion strength and dissipated energy, the bond-mediated interface is found to resist peeling in a strongly rate-dependent manner.

Friction stir welding process to repair voids in aluminum alloys

NASA Technical Reports Server (NTRS)

Rosen, Charles D. (Inventor); Litwinski, Edward (Inventor); Valdez, Juan M. (Inventor)

1999-01-01

The present invention provides an in-process method to repair voids in an aluminum alloy, particularly a friction stir weld in an aluminum alloy. For repairing a circular void or an in-process exit hole in a weld, the method includes the steps of fabricating filler material of the same composition or compatible with the parent material into a plug form to be fitted into the void, positioning the plug in the void, and friction stir welding over and through the plug. For repairing a longitudinal void (30), the method includes machining the void area to provide a trough (34) that subsumes the void, fabricating filler metal into a strip form (36) to be fitted into the trough, positioning the strip in the trough, and rewelding the void area by traversing a friction stir welding tool longitudinally through the strip. The method is also applicable for repairing welds made by a fusing welding process or voids in aluminum alloy workpieces themselves.

Numerical Analysis of Edge Over Coating and Baffle Effect on Hot-Dip Galvanizing

NASA Astrophysics Data System (ADS)

Bao, Chengren; Kang, Yonglin; Li, Yan

2017-06-01

In hot-dip galvanizing process, air jet wiping control is so crucial to determine the coating thickness and uniformity of the zinc layer on the steel strip. A numerical simulation of gas-jet wiping in hot-dip galvanizing was conducted to minimize the occurrence of edge over coating (EOC). The causes of EOC were identified by contrasting and analyzing the airflow fields on the strip edge with and without a baffle. The factors influencing the airflow field on the strip edge during the change in the gap between the baffle and the strip edge were also analyzed. The effect of the distance between the air knife and the strip was evaluated. Technological parameters with on-site guidance role were obtained by combining them with the actual production to elucidate the role of the baffle in restraining the occurrence of EOC. The uniform distribution of pressure and coating thickness on the strip is achieved when the distance of the baffle from the strip edge is about 0.3 times of the jetting distance.

SOLVENT EXTRACTION PROCESS

DOEpatents

Jonke, A.A.

1957-10-01

In improved solvent extraction process is described for the extraction of metal values from highly dilute aqueous solutions. The process comprises contacting an aqueous solution with an organic substantially water-immiscible solvent, whereby metal values are taken up by a solvent extract phase; scrubbing the solvent extract phase with an aqueous scrubbing solution; separating an aqueous solution from the scrubbed solvent extract phase; and contacting the scrubbed solvent phase with an aqueous medium whereby the extracted metal values are removed from the solvent phase and taken up by said medium to form a strip solution containing said metal values, the aqueous scrubbing solution being a mixture of strip solution and an aqueous solution which contains mineral acids anions and is free of the metal values. The process is particularly effective for purifying uranium, where one starts with impure aqueous uranyl nitrate, extracts with tributyl phosphate dissolved in carbon tetrachloride, scrubs with aqueous nitric acid and employs water to strip the uranium from the scrubbed organic phase.

Surface mining

Treesearch

Robert Leopold; Bruce Rowland; Reed Stalder

1979-01-01

The surface mining process consists of four phases: (1) exploration; (2) development; (3) production; and (4) reclamation. A variety of surface mining methods has been developed, including strip mining, auger, area strip, open pit, dredging, and hydraulic. Sound planning and design techniques are essential to implement alternatives to meet the myriad of laws,...

Double exposure using 193nm negative tone photoresist

NASA Astrophysics Data System (ADS)

Kim, Ryoung-han; Wallow, Tom; Kye, Jongwook; Levinson, Harry J.; White, Dave

2007-03-01

Double exposure is one of the promising methods for extending lithographic patterning into the low k I regime. In this paper, we demonstrate double patterning of k 1-effective=0.25 with improved process window using a negative resist. Negative resist (TOK N- series) in combination with a bright field mask is proven to provide a large process window in generating 1:3 = trench:line resist features. By incorporating two etch transfer steps into the hard mask material, frequency doubled patterns could be obtained.

Optimization of plasma etching of SiO2 as hard mask for HgCdTe dry etching

NASA Astrophysics Data System (ADS)

Chen, Yiyu; Ye, Zhenhua; Sun, Changhong; Zhang, Shan; Xin, Wen; Hu, Xiaoning; Ding, Ruijun; He, Li

2016-10-01

HgCdTe is one of the dominating materials for infrared detection. To pattern this material, our group has proven the feasibility of SiO2 as a hard mask in dry etching process. In recent years, the SiO2 mask patterned by plasma with an auto-stopping layer of ZnS sandwiched between HgCdTe and SiO2 has been developed by our group. In this article, we will report the optimization of SiO2 etching on HgCdTe. The etching of SiO2 is very mature nowadays. Multiple etching recipes with deferent gas mixtures can be used. We utilized a recipe containing Ar and CHF3. With strictly controlled photolithography, the high aspect-ratio profile of SiO2 was firstly achieved on GaAs substrate. However, the same recipe could not work well on MCT because of the low thermal conductivity of HgCdTe and CdTe, resulting in overheated and deteriorated photoresist. By decreasing the temperature, the photoresist maintained its good profile. A starting table temperature around -5°C worked well enough. And a steep profile was achieved as checked by the SEM. Further decreasing of temperature introduced profile with beveled corner. The process window of the temperature is around 10°C. Reproducibility and uniformity were also confirmed for this recipe.

Fabrication of a 3D micro/nano dual-scale carbon array and its demonstration as the microelectrodes for supercapacitors

NASA Astrophysics Data System (ADS)

Jiang, Shulan; Shi, Tielin; Gao, Yang; Long, Hu; Xi, Shuang; Tang, Zirong

2014-04-01

An easily accessible method is proposed for the fabrication of a 3D micro/nano dual-scale carbon array with a large surface area. The process mainly consists of three critical steps. Firstly, a hemispherical photoresist micro-array was obtained by the cost-effective nanoimprint lithography process. Then the micro-array was transformed into hierarchical structures with longitudinal nanowires on the microstructure surface by oxygen plasma etching. Finally, the micro/nano dual-scale carbon array was fabricated by carbonizing these hierarchical photoresist structures. It has also been demonstrated that the micro/nano dual-scale carbon array can be used as the microelectrodes for supercapacitors by the electrodeposition of a manganese dioxide (MnO2) film onto the hierarchical carbon structures with greatly enhanced electrochemical performance. The specific gravimetric capacitance of the deposited micro/nano dual-scale microelectrodes is estimated to be 337 F g-1 at the scan rate of 5 mV s-1. This proposed approach of fabricating a micro/nano dual-scale carbon array provides a facile way in large-scale microstructures’ manufacturing for a wide variety of applications, including sensors and on-chip energy storage devices.

Effect of intermediate annealing on the microstructure and mechanical property of ZK60 magnesium alloy produced by twin roll casting and hot rolling

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chen, Hongmei, E-mail: hmchen@just.edu.cn; Zang, Qianhao; Yu, Hui

2015-08-15

Twin roll cast (designated as TRC in short) ZK60 magnesium alloy strip with 3.5 mm thickness was used in this paper. The TRC ZK60 strip was multi-pass rolled at different temperatures, intermediate annealing heat treatment was performed when the thickness of the strip changed from 3.5 mm to 1 mm, and then continued to be rolled until the thickness reached to 0.5 mm. The effect of intermediate annealing during rolling process on microstructure, texture and room temperature mechanical properties of TRC ZK60 strip was studied by using OM, TEM, XRD and electronic universal testing machine. The introduction of intermediate annealingmore » can contribute to recrystallization in the ZK60 sheet which was greatly deformed, and help to reduce the stress concentration generated in the rolling process. Microstructure uniformity and mechanical properties of the ZK60 alloy sheet were also improved; in particular, the room temperature elongation was greatly improved. When the TRC ZK60 strip was rolled at 300 °C and 350 °C, the room temperature elongation of the rolled sheet with 0.5 mm thickness which was intermediate annealed during the rolling process was increased by 95% and 72% than that of no intermediate annealing, respectively. - Highlights: • Intermediate annealing was introduced during hot rolling process of twin roll cast ZK60 alloy. • Intermediate annealing can contribute to recrystallization and reduce the stress concentration in the deformed ZK60 sheet. • Microstructure uniformity and mechanical properties of the ZK60 sheet were improved, in particular, the room temperature elongation. • The elongation of the rolled ZK60 sheet after intermediate annealed was increased by 95% and 72% than that of no intermediate annealing.« less

A simplified method for generating periodic nanostructures by interference lithography without the use of an anti-reflection coating

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kapon, Omree; Muallem, Merav; Palatnik, Alex

Interference lithography has proven to be a useful technique for generating periodic sub-diffraction limited nanostructures. Interference lithography can be implemented by exposing a photoresist polymer to laser light using a two-beam arrangement or more simply a one beam configuration based on a Lloyd's Mirror Interferometer. For typical photoresist layers, an anti-reflection coating must be deposited on the substrate to prevent adverse reflections from cancelling the holographic pattern of the interfering beams. For silicon substrates, such coatings are typically multilayered and complex in composition. By thinning the photoresist layer to a thickness well below the quarter wavelength of the exposing beam,more » we demonstrate that interference gratings can be generated without an anti-reflection coating on the substrate. We used ammonium dichromate doped polyvinyl alcohol as the positive photoresist because it provides excellent pinhole free layers down to thicknesses of 40 nm, and can be cross-linked by a low-cost single mode 457 nm laser, and can be etched in water. Gratings with a period of 320 nm and depth of 4 nm were realized, as well as a variety of morphologies depending on the photoresist thickness. This simplified interference lithography technique promises to be useful for generating periodic nanostructures with high fidelity and minimal substrate treatments.« less

Dominant root locus in state estimator design for material flow processes: A case study of hot strip rolling.

PubMed

Fišer, Jaromír; Zítek, Pavel; Skopec, Pavel; Knobloch, Jan; Vyhlídal, Tomáš

2017-05-01

The purpose of the paper is to achieve a constrained estimation of process state variables using the anisochronic state observer tuned by the dominant root locus technique. The anisochronic state observer is based on the state-space time delay model of the process. Moreover the process model is identified not only as delayed but also as non-linear. This model is developed to describe a material flow process. The root locus technique combined with the magnitude optimum method is utilized to investigate the estimation process. Resulting dominant roots location serves as a measure of estimation process performance. The higher the dominant (natural) frequency in the leftmost position of the complex plane the more enhanced performance with good robustness is achieved. Also the model based observer control methodology for material flow processes is provided by means of the separation principle. For demonstration purposes, the computer-based anisochronic state observer is applied to the strip temperatures estimation in the hot strip finishing mill composed of seven stands. This application was the original motivation to the presented research. Copyright © 2017 ISA. Published by Elsevier Ltd. All rights reserved.

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography.

PubMed

Rananavare, Shankar B; Morakinyo, Moshood K

2017-02-12

Nano-patterns fabricated with extreme ultraviolet (EUV) or electron-beam (E-beam) lithography exhibit unexpected variations in size. This variation has been attributed to statistical fluctuations in the number of photons/electrons arriving at a given nano-region arising from shot-noise (SN). The SN varies inversely to the square root of a number of photons/electrons. For a fixed dosage, the SN is larger in EUV and E-beam lithographies than for traditional (193 nm) optical lithography. Bottom-up and top-down patterning approaches are combined to minimize the effects of shot noise in nano-hole patterning. Specifically, an amino-silane surfactant self-assembles on a silicon wafer that is subsequently spin-coated with a 100 nm film of a PMMA-based E-beam photoresist. Exposure to the E-beam and the subsequent development uncover the underlying surfactant film at the bottoms of the holes. Dipping the wafer in a suspension of negatively charged, citrate-capped, 20 nm gold nanoparticles (GNP) deposits one particle per hole. The exposed positively charged surfactant film in the hole electrostatically funnels the negatively charged nanoparticle to the center of an exposed hole, which permanently fixes the positional registry. Next, by heating near the glass transition temperature of the photoresist polymer, the photoresist film reflows and engulfs the nanoparticles. This process erases the holes affected by SN but leaves the deposited GNPs locked in place by strong electrostatic binding. Treatment with oxygen plasma exposes the GNPs by etching a thin layer of the photoresist. Wet-etching the exposed GNPs with a solution of I2/KI yields uniform holes located at the center of indentations patterned by E-beam lithography. The experiments presented show that the approach reduces the variation in the size of the holes caused by SN from 35% to below 10%. The method extends the patterning limits of transistor contact holes to below 20 nm.

A peptide hormone required for Casparian strip diffusion barrier formation in Arabidopsis roots.

PubMed

Nakayama, Takuya; Shinohara, Hidefumi; Tanaka, Mina; Baba, Koki; Ogawa-Ohnishi, Mari; Matsubayashi, Yoshikatsu

2017-01-20

Plants achieve mineral ion homeostasis by means of a hydrophobic barrier on endodermal cells called the Casparian strip, which restricts lateral diffusion of ions between the root vascular bundles and the soil. We identified a family of sulfated peptides required for contiguous Casparian strip formation in Arabidopsis roots. These peptide hormones, which we named Casparian strip integrity factor 1 (CIF1) and CIF2, are expressed in the root stele and specifically bind the endodermis-expressed leucine-rich repeat receptor kinase GASSHO1 (GSO1)/SCHENGEN3 and its homolog, GSO2. A mutant devoid of CIF peptides is defective in ion homeostasis in the xylem. CIF genes are environmentally responsive. Casparian strip regulation is not merely a passive process driven by root developmental cues; it also serves as an active strategy to cope with adverse soil conditions. Copyright © 2017, American Association for the Advancement of Science.

Superconducting microcircuitry by the microlithographic patterning of superconducting compounds and related materials

DOEpatents

Coppa, N.V.

1993-08-24

A method is described of producing superconducting microcircuits comprising the steps of: depositing a thin film of Ba[sub 2]Cu[sub 3]O[sub 5+x](O < x < 1) onto a substrate; depositing a thin film of a dopant onto said thin film of Ba[sub 2]Cu[sub 3]O[sub 5+x]; depositing a photoresist onto said thin film of a dopant; shining light through a mask containing a pattern for a desired circuit configuration and onto said photoresist; developing said photoresist to remove portions of said photoresist shined by the light and to selectively expose said dopant film; etching said selectively exposed dopant film from said thin film of Ba[sub 2]Cu[sub 3]O[sub 5+x] to form a pattern of dopant; and heating said substrate at a temperature and for a period of time sufficient to diffuse and react said pattern of dopant with said thin film of Ba[sub 2]Cu[sub 3]O[sub 5+x].

Reconditioning of semiconductor substrates to remove photoresist during semiconductor device fabrication

DOEpatents

Farino, Anthony J.

2004-01-27

A method for reconditioning the surface of a semiconductor substrate to remove an unwanted (i.e. defective) layer of photoresist is disclosed. The method adapts a conventional automated spinner which is used to rotate the substrate at high speed while a stream of a first solvent (e.g. acetone) is used to dissolve the photoresist. A stream of a second solvent (e.g. methanol) is then used to clean the substrate at a lower speed, with the substrate being allowed to dry with continued rotation. The method of the present invention can be used within a photolithography track so that the substrates need never leave the track for reconditioning.

Application To Bilayer System With Water-Soluble Contrast Enhancing Material

NASA Astrophysics Data System (ADS)

Yabuta, Mitsuo; Ito, Naoki; Yamazaki, Hiroyuki; Nakayama, Toshimasa

1987-09-01

We have developed ,a water-soluble contrast enhancing material, TAD-436 ( Tokyo Ohka. Anti-Defocus Material ) which is consisted of a water-soluble diazonium salt as bleaching compounds and a water-soluble anion type polymer as binder polymers. Needless to say that water is used as solvent in TAD; therefore, it can be spincoated directly on a positive photoresist layer of a quinonediazide-novolak resin type without causing intermixing and furtheremore the bilayer can be developed without stripping TAD immediately after exposure. TAD shows a satisfactory bleaching characteristics on g-line, increases r-value of underlying photoresist and reduces the thickness loss of photoresist layer in unexposed area. Application to bilayer system with TAD will raise the resolution of underlying photoresist and when the focus depth is changed it will make the change in the resist profile small. As the result of it, the notches in the resist patterns on steps is reduced, making the difference in the linewidth between the top and the bottom of steps small.

UV-LIGA microfabrication process for sub-terahertz waveguides utilizing multiple layered SU-8 photoresist

NASA Astrophysics Data System (ADS)

Malekabadi, Ali; Paoloni, Claudio

2016-09-01

A microfabrication process based on UV LIGA (German acronym of lithography, electroplating and molding) is proposed for the fabrication of relatively high aspect ratio sub-terahertz (100-1000 GHz) metal waveguides, to be used as a slow wave structure in sub-THz vacuum electron devices. The high accuracy and tight tolerances required to properly support frequencies in the sub-THz range can be only achieved by a stable process with full parameter control. The proposed process, based on SU-8 photoresist, has been developed to satisfy high planar surface requirements for metal sub-THz waveguides. It will be demonstrated that, for a given thickness, it is more effective to stack a number of layers of SU-8 with lower thickness rather than using a single thick layer obtained at lower spin rate. The multiple layer approach provides the planarity and the surface quality required for electroforming of ground planes or assembly surfaces and for assuring low ohmic losses of waveguides. A systematic procedure is provided to calculate soft and post-bake times to produce high homogeneity SU-8 multiple layer coating as a mold for very high quality metal waveguides. A double corrugated waveguide designed for 0.3 THz operating frequency, to be used in vacuum electronic devices, was fabricated as test structure. The proposed process based on UV LIGA will enable low cost production of high accuracy sub-THz 3D waveguides. This is fundamental for producing a new generation of affordable sub-THz vacuum electron devices, to fill the technological gap that still prevents a wide diffusion of numerous applications based on THz radiation.

Processing of Superconductor-Normal-Superconductor Josephson Edge Junctions

NASA Technical Reports Server (NTRS)

Kleinsasser, A. W.; Barner, J. B.

1997-01-01

The electrical behavior of epitaxial superconductor-normal-superconductor (SNS) Josephson edge junctions is strongly affected by processing conditions. Ex-situ processes, utilizing photoresist and polyimide/photoresist mask layers, are employed for ion milling edges for junctions with Yttrium-Barium-Copper-Oxide (YBCO) electrodes and primarily Co-doped YBCO interlayers.

The Influence of Vanadium Microalloying on the Production of Thin Slab Casting and Direct Rolled Steel Strip

NASA Astrophysics Data System (ADS)

Li, Yu; Milbourn, David

Vanadium microalloying is highly effective in high strength strip steels produced by thin slab casting and direct rolled process. Because of the high solubility of V(C,N) in austenite, vanadium is likely to remain in solution during casting, equalisation and rolling. Vanadium microalloyed steels have better hot ductility and are less prone to transverse cracking than niobium containing steels. Despite a coarse as-cast austenite grain size before rolling, significant grain refinement can be achieved in vanadium microalloyed steels by repeated recrystallization during rolling, resulting in a fine uniform ferrite microstructure in final strip. Almost all vanadium present in microalloyed steels is available to precipitate in ferrite as very fine particles, contributing to precipitation strengthening. Vanadium microalloyed steels show less sensitivity to rolling process variables and exhibit excellent combination of strength and toughness.

Solid State Research.

DTIC Science & Technology

1995-05-15

cooled to room temperature. Titanium isopropoxide and zirconium n-propoxide were then added (inside a glove box) to levels that correspond to the...ously patterned with a 200-nm-thick evaporated platinum film. In addition to the platinum there was a 40-nm titanium adhesion layer between the...an etch composed of buffered HF, HC1 and H20 [6]. By using a photoresist lift-off process, the top titanium -gold layer is formed, which provides the

Experimental determination of the impact of polysilicon LER on sub-100-nm transistor performance

NASA Astrophysics Data System (ADS)

Patterson, Kyle; Sturtevant, John L.; Alvis, John R.; Benavides, Nancy; Bonser, Douglas; Cave, Nigel; Nelson-Thomas, Carla; Taylor, William D.; Turnquest, Karen L.

2001-08-01

Photoresist line edge roughness (LER) has long been feared as a potential limitation to the application of various patterning technologies to actual devices. While this concern seems reasonable, experimental verification has proved elusive and thus LER specifications are typically without solid parametric rationale. We report here the transistor device performance impact of deliberate variations of polysilicon gate LER. LER magnitude was attenuated by more than a factor of 5 by altering the photoresist type and thickness, substrate reflectivity, masking approach, and etch process. The polysilicon gate LER for nominally 70 - 150 nm devices was quantified using digital image processing of SEM images, and compared to gate leakage and drive current for variable length and width transistors. With such comparisons, realistic LER specifications can be made for a given transistor. It was found that subtle cosmetic LER differences are often not discernable electrically, thus providing hope that LER will not limit transistor performance as the industry migrates to sub-100 nm patterning.

Extreme ultraviolet patterning of tin-oxo cages

NASA Astrophysics Data System (ADS)

Haitjema, Jarich; Zhang, Yu; Vockenhuber, Michaela; Kazazis, Dimitrios; Ekinci, Yasin; Brouwer, Albert M.

2017-07-01

We report on the extreme ultraviolet (EUV) patterning performance of tin-oxo cages. These cage molecules were already known to function as a negative tone photoresist for EUV radiation, but in this work, we significantly optimized their performance. Our results show that sensitivity and resolution are only meaningful photoresist parameters if the process conditions are optimized. We focus on contrast curves of the materials using large area EUV exposures and patterning of the cages using EUV interference lithography. It is shown that baking steps, such as postexposure baking, can significantly affect both the sensitivity and contrast in the open-frame experiments as well as the patterning experiments. A layer thickness increase reduced the necessary dose to induce a solubility change but decreased the patterning quality. The patterning experiments were affected by minor changes in processing conditions such as an increased rinsing time. In addition, we show that the anions of the cage can influence the sensitivity and quality of the patterning, probably through their effect on physical properties of the materials.

A design aid for determining width of filter strips

Treesearch

M.G. Dosskey; M.J. Helmers; D.E. Eisenhauer

2008-01-01

watershed planners need a tool for determining width of filter strips that is accurate enough for developing cost-effective site designs and easy enough to use for making quick determinations on a large number and variety of sites.This study employed the process-based Vegetative Filter Strip Model to evaluate the relationship between filter strip width and trapping...

Lithographically defined microporous carbon-composite structures

DOEpatents

Burckel, David Bruce; Washburn, Cody M.; Lambert, Timothy N.; Finnegan, Patrick Sean; Wheeler, David R.

2016-12-06

A microporous carbon scaffold is produced by lithographically patterning a carbon-containing photoresist, followed by pyrolysis of the developed resist structure. Prior to exposure, the photoresist is loaded with a nanoparticulate material. After pyrolysis, the nanonparticulate material is dispersed in, and intimately mixed with, the carbonaceous material of the scaffold, thereby yielding a carbon composite structure.

Quadrilateral Micro-Hole Array Machining on Invar Thin Film: Wet Etching and Electrochemical Fusion Machining

PubMed Central

Choi, Woong-Kirl; Kim, Seong-Hyun; Choi, Seung-Geon; Lee, Eun-Sang

2018-01-01

Ultra-precision products which contain a micro-hole array have recently shown remarkable demand growth in many fields, especially in the semiconductor and display industries. Photoresist etching and electrochemical machining are widely known as precision methods for machining micro-holes with no residual stress and lower surface roughness on the fabricated products. The Invar shadow masks used for organic light-emitting diodes (OLEDs) contain numerous micro-holes and are currently machined by a photoresist etching method. However, this method has several problems, such as uncontrollable hole machining accuracy, non-etched areas, and overcutting. To solve these problems, a machining method that combines photoresist etching and electrochemical machining can be applied. In this study, negative photoresist with a quadrilateral hole array pattern was dry coated onto 30-µm-thick Invar thin film, and then exposure and development were carried out. After that, photoresist single-side wet etching and a fusion method of wet etching-electrochemical machining were used to machine micro-holes on the Invar. The hole machining geometry, surface quality, and overcutting characteristics of the methods were studied. Wet etching and electrochemical fusion machining can improve the accuracy and surface quality. The overcutting phenomenon can also be controlled by the fusion machining. Experimental results show that the proposed method is promising for the fabrication of Invar film shadow masks. PMID:29351235

Evaluation of electron beam stabilization for ion implant processing

NASA Astrophysics Data System (ADS)

Buffat, Stephen J.; Kickel, Bee; Philipps, B.; Adams, J.; Ross, Matthew F.; Minter, Jason P.; Marlowe, Trey; Wong, Selmer S.

1999-06-01

With the integration of high energy ion implant processes into volume CMOS manufacturing, the need for thick resist stabilization to achieve a stable ion implant process is critical. With new photoresist characteristics, new implant end station characteristics arise. The resist outgassing needs to be addressed as well as the implant profile to ensure that the dosage is correct and the implant angle does not interfere with other underlying features. This study compares conventional deep-UV/thermal with electron beam stabilization. The electron beam system used in this study utilizes a flood electron source and is a non-thermal process. These stabilization techniques are applied to a MeV ion implant process in a CMOS production process flow.

Fabrication of an artificial nanosucker device with a large area nanotube array of metallic glass.

PubMed

Chen, Wei-Ting; Manivannan, Karthikeyan; Yu, Chia-Chi; Chu, Jinn P; Chen, Jem-Kun

2018-01-18

The concurrent attachment and detachment movements of geckos on virtually any type of surface via their foot pads have inspired us to develop a thermal device with numerous arrangements of a multi-layer thin film together with electrodes that can help modify the temperature of the surface via application of a voltage. A sequential fabrication process was employed on a large-scale integration to generate well-defined contact hole arrays of photoresist for use as templates on the electrode-based device. The photoresist templates were then subjected to sputter deposition of the metallic glass Zr 55 Cu 30 Al 10 Ni 5 . Consequently, a metallic glass nanotube (MGNT) array having a nominal wall thickness of 100 nm was obtained after removal of the photoresist template. When a water droplet was placed on the MGNT array, close nanochambers of metallic glass were formed. By applying voltage, the surface was heated to increase the pressure inside the nanochambers; this generated an expanding force that raised the droplet; thus, the static water contact angle (SWCA) was increased. In contrast, a sucking force was generated during surface cooling, which decreased the SWCA. Our fabrication strategy exploits the MGNT array surface as nanosuckers, which can mimic the climbing aptitude of geckos as they attach to (>10 N m -2 ) and detach from (0.26 N m -2 ) surfaces at 0.5 and 3 V of applied voltage, respectively. Thus, the climbing aptitude of geckos can be mimicked by employing the processing strategy presented herein for the development of artificial foot pads.

Method and apparatus for improved melt flow during continuous strip casting

DOEpatents

Follstaedt, D.W.; King, E.L.; Schneider, K.C.

1991-11-12

The continuous casting of metal strip using the melt overflow process is improved by controlling the weir conditions in the nozzle to provide a more uniform flow of molten metal across the width of the nozzle and reducing the tendency for freezing of metal along the interface with refractory surfaces. A weir design having a sloped rear wall and tapered sidewalls and critical gap controls beneath the weir has resulted in the drastic reduction in edge tearing and a significant improvement in strip uniformity. The floor of the container vessel is preferably sloped and the gap between the nozzle and the rotating substrate is critically controlled. The resulting flow patterns observed with the improved casting process have reduced thermal gradients in the bath, contained surface slag and eliminated undesirable solidification near the discharge area by increasing the flow rates at those points. 8 figures.

A Novel, Aqueous Surface Treatment To Thermally Stabilize High Resolution Positive Photoresist Images*

NASA Astrophysics Data System (ADS)

Grunwald, John J.; Spencer, Allen C.

1986-07-01

The paper describes a new approach to thermally stabilize the already imaged profile of high resolution positive photoresists such as ULTRAMAC" PR-914. ***XD-4000, an aqueous emulsion of a blend of fluorine-bearing compounds is spun on top of the developed, positive photoresist-imaged wafer, and baked. This allows the photoresist to withstand temperatures up to at least 175 deg. C. while essentially maintaining vertical edge profiles. Also, adverse effects of "outgassing" in harsh environments, ie., plasma and ion implant are greatly minimized by allowing the high resolution imaged photoresist to be post-baked at "elevated" temperatures. Another type of product that accomplishes the same effect is ***XD-4005, an aqueous emulsion of a high temperature-resistant polymer. While the exact mechanism is yet to be identified, it is postulated that absorption of the "polymeric" species into the "skin" of the imaged resist forms a temperature resistant "envelope", thereby allowing high resolution photoresists to also serve in a "high temperature" mode, without reticulation, or other adverse effects due to thermal degradation. SEM's are presented showing imaged ULTRAMAC" PR-914 and ULTRAMAC" **EPA-914 geometries coated with XD-4000 or XD-4005 and followed by plasma etched oxide,polysilicon and aluminum. Selectivity ratios are compared with and without the novel treatment and are shown to be significantly better with the treatment. The surface-treated photoresist for thermal resistance remains easily strippable in solvent-based or plasma media, unlike photoresists that have undergone "PRIST" or other gaseous thermal stabilization methods.

Optical monitor for real time thickness change measurements via lateral-translation induced phase-stepping interferometry

DOEpatents

Rushford, Michael C.

2002-01-01

An optical monitoring instrument monitors etch depth and etch rate for controlling a wet-etching process. The instrument provides means for viewing through the back side of a thick optic onto a nearly index-matched interface. Optical baffling and the application of a photoresist mask minimize spurious reflections to allow for monitoring with extremely weak signals. A Wollaston prism enables linear translation for phase stepping.

Integrating nanosphere lithography in device fabrication

NASA Astrophysics Data System (ADS)

Laurvick, Tod V.; Coutu, Ronald A.; Lake, Robert A.

2016-03-01

This paper discusses the integration of nanosphere lithography (NSL) with other fabrication techniques, allowing for nano-scaled features to be realized within larger microelectromechanical system (MEMS) based devices. Nanosphere self-patterning methods have been researched for over three decades, but typically not for use as a lithography process. Only recently has progress been made towards integrating many of the best practices from these publications and determining a process that yields large areas of coverage, with repeatability and enabled a process for precise placement of nanospheres relative to other features. Discussed are two of the more common self-patterning methods used in NSL (i.e. spin-coating and dip coating) as well as a more recently conceived variation of dip coating. Recent work has suggested the repeatability of any method depends on a number of variables, so to better understand how these variables affect the process a series of test vessels were developed and fabricated. Commercially available 3-D printing technology was used to incrementally alter the test vessels allowing for each variable to be investigated individually. With these deposition vessels, NSL can now be used in conjunction with other fabrication steps to integrate features otherwise unattainable through current methods, within the overall fabrication process of larger MEMS devices. Patterned regions in 1800 series photoresist with a thickness of ~700nm are used to capture regions of self-assembled nanospheres. These regions are roughly 2-5 microns in width, and are able to control the placement of 500nm polystyrene spheres by controlling where monolayer self-assembly occurs. The resulting combination of photoresist and nanospheres can then be used with traditional deposition or etch methods to utilize these fine scale features in the overall design.

Studies of the phytoplankton and soil algae of two strip-mine impoundments in Tuscarawas County, Ohio

DOE Office of Scientific and Technical Information (OSTI.GOV)

Richards, J.N.

1973-01-01

The process of strip-mining leaves vast areas that are denuded of vegetation and are open to primary succession by organisms such as algae. Acid strip-mine impoundments are either formed by man-made or natural processes. These impoundments are remnants of old strip-mine pits that have been filled with runoff water. The water chemistry of these ponds reflects the chemistry of the earth strata above the coal seam that was mined. These young impoundments or ponds are extremely low in pH and quite acidic due to the presence of great amounts of sulfuric acid. Algae that are found in these types ofmore » habitats exhibit a tolerance to acid conditions and are considered to be acidophilic. Few species of algae are known to be common componenets of these habitats.« less

Manufacturing Methods and Technology Project Summary Reports.

DTIC Science & Technology

1980-12-01

deposition of chrome-copper (Cr- Cu ), dry-film photoresist application, photolithographic masking, spray etching, die bonding, ultrasonic...4) cold roll forging. Of these, the cold roll forging process is the most widely used for the pro- duction of steel and low alloy blades. It provides... sprayed Mo- Al -Ni both provide relatively good wear resistance, see Figure 1. The powder -flame sprayed aluminum bronze did not perform as well. 147 -S t. I

Method and apparatus for improved melt flow during continuous strip casting

DOEpatents

Follstaedt, Donald W.; King, Edward L.; Schneider, Ken C.

1991-11-12

The continuous casting of metal strip using the melt overflow process is improved by controlling the weir conditions in the nozzle to provide a more uniform flow of molten metal across the width of the nozzle and reducing the tendency for freezing of metal along the interface with refractory surfaces. A weir design having a sloped rear wall and tapered sidewalls and critical gap controls beneath the weir has resulted in the drastic reduction in edge tearing and a significant improvement in strip uniformity. The floor of the container vessel is preferably sloped and the gap between the nozzle and the rotating substrate is critically controlled. The resulting flow patterns observed with the improved casting process have reduced thermal gradients in the bath, contained surface slag and eliminated undesirable solidification near the discharge area by increasing the flow rates at those points.

3-D laser patterning process utilizing horizontal and vertical patterning

DOEpatents

Malba, Vincent; Bernhardt, Anthony F.

2000-01-01

A process which vastly improves the 3-D patterning capability of laser pantography (computer controlled laser direct-write patterning). The process uses commercially available electrodeposited photoresist (EDPR) to pattern 3-D surfaces. The EDPR covers the surface of a metal layer conformally, coating the vertical as well as horizontal surfaces. A laser pantograph then patterns the EDPR, which is subsequently developed in a standard, commercially available developer, leaving patterned trench areas in the EDPR. The metal layer thereunder is now exposed in the trench areas and masked in others, and thereafter can be etched to form the desired pattern (subtractive process), or can be plated with metal (additive process), followed by a resist stripping, and removal of the remaining field metal (additive process). This improved laser pantograph process is simpler, faster, move manufacturable, and requires no micro-machining.

Theoretical modeling of PEB procedure on EUV resist using FDM formulation

NASA Astrophysics Data System (ADS)

Kim, Muyoung; Moon, Junghwan; Choi, Joonmyung; Lee, Byunghoon; Jeong, Changyoung; Kim, Heebom; Cho, Maenghyo

2018-03-01

Semiconductor manufacturing industry has reduced the size of wafer for enhanced productivity and performance, and Extreme Ultraviolet (EUV) light source is considered as a promising solution for downsizing. A series of EUV lithography procedures contain complex photo-chemical reaction on photoresist, and it causes technical difficulties on constructing theoretical framework which facilitates rigorous investigation of underlying mechanism. Thus, we formulated finite difference method (FDM) model of post exposure bake (PEB) process on positive chemically amplified resist (CAR), and it involved acid diffusion coupled-deprotection reaction. The model is based on Fick's second law and first-order chemical reaction rate law for diffusion and deprotection, respectively. Two kinetic parameters, diffusion coefficient of acid and rate constant of deprotection, which were obtained by experiment and atomic scale simulation were applied to the model. As a result, we obtained time evolutional protecting ratio of each functional group in resist monomer which can be used to predict resulting polymer morphology after overall chemical reactions. This achievement will be the cornerstone of multiscale modeling which provides fundamental understanding on important factors for EUV performance and rational design of the next-generation photoresist.

Laser direct writing and inkjet printing for a sub-2 μm channel length MoS2 transistor with high-resolution electrodes

NASA Astrophysics Data System (ADS)

Kwon, Hyuk-Jun; Chung, Seungjun; Jang, Jaewon; Grigoropoulos, Costas P.

2016-10-01

Patterns formed by the laser direct writing (LDW) lithography process are used either as channels or barriers for MoS2 transistors fabricated via inkjet printing. Silver (Ag) nanoparticle ink is printed over patterns formed on top of the MoS2 flakes in order to construct high-resolution source/drain (S/D) electrodes. When positive photoresist is used, the produced grooves are filled with inkjetted Ag ink by capillary forces. On the other hand, in the case of negative photoresist, convex barrier-like patterns are written on the MoS2 flakes and patterns, dividing the printed Ag ink into the S/D electrodes by self-alignment. LDW lithography combined with inkjet printing is applied to MoS2 thin-film transistors that exhibit moderate electrical performance such as mobility and subthreshold swing. However, especially in the linear operation regime, their features are limited by the contact effect. The Y-function method can exclude the contact effect and allow proper evaluation of the maximum available mobility and contact resistance. The presented fabrication methods may facilitate the development of cost-effective fabrication processes.

Silver nanowires as the current collector for a flexible in-plane micro-supercapacitor via a one-step, mask-free patterning strategy

NASA Astrophysics Data System (ADS)

Liu, Lang; Li, Han-Yu; Yu, Yao; Liu, Lin; Wu, Yue

2018-02-01

The fabrication of a current collector-contained in-plane micro-supercapacitor (MSC) usually requires the patterning of the current collector first and then subsequent patterning of the active material with the assistance of a photoresist and mask. However, this two-step patterning process is too complicated and the photoresist used is harmful to the properties of nanomaterials. Here, we demonstrate a one-step, mask-free strategy to pattern the current collector and the active material at the same time, for the fabrication of an all-solid-state flexible in-plane MSC. Silver nanowires (AgNWs) are used as the current collector. An atmospheric pressure pulsed cold micro-plasma-jet is used to realize the one-step, mask-free production of interdigitated multi-walled carbon nanotube (MWCNT)/AgNW electrodes. Remarkably, the fabricated MWCNT/AgNW-based MSC shows good flexibility and excellent rate capability. Moreover, the performance of properties including cyclic stability, equivalent series resistance, relaxation time and energy/power densities of the MWCNT/AgNW-based MSC are significantly enhanced by the presence of the AgNW current collector.

Supercritical fluid processing: a new dry technique for photoresist developing

NASA Astrophysics Data System (ADS)

Gallagher-Wetmore, Paula M.; Wallraff, Gregory M.; Allen, Robert D.

1995-06-01

Supercritical fluid (SCF) technology is investigated as a dry technique for photoresist developing. Because of their unique combination of gaseous and liquid-like properties, these fluids offer comparative or improved efficiencies over liquid developers and, particularly carbon dioxide, would have tremendous beneficial impact on the environment and on worker safety. Additionally, SCF technology offers the potential for processing advanced resist systems which are currently under investigation as well as those that may have been abandoned due to problems associated with conventional developers. An investigation of various negative and positive photoresist systems is ongoing. Initially, supercritical carbon dioxide (SC CO2) as a developer for polysilane resists was explored because the exposure products, polysiloxanes, are generally soluble in this fluid. These initial studies demonstrated the viability of the SCF technique with both single layer and bilayer systems. Subsequently, the investigation focused on using SC CO2 to produce negative images with polymers that would typically be considered positive resists. Polymers such as styrenes and methacrylates were chemically modified by fluorination and/or copolymerization to render them soluble in SC CO2. Siloxane copolymers and siloxane-modified methacrylates were examined as well. The preliminary findings reported here indicate the feasibility of using SC CO2 for photoresist developing.

Atomic layer deposition on phase-shift lithography generated photoresist patterns for 1D nanochannel fabrication.

PubMed

Güder, Firat; Yang, Yang; Krüger, Michael; Stevens, Gregory B; Zacharias, Margit

2010-12-01

A versatile, low-cost, and flexible approach is presented for the fabrication of millimeter-long, sub-100 nm wide 1D nanochannels with tunable wall properties (wall thickness and material) over wafer-scale areas on glass, alumina, and silicon surfaces. This approach includes three fabrication steps. First, sub-100 nm photoresist line patterns were generated by near-field contact phase-shift lithography (NFC-PSL) using an inexpensive homemade borosilicate mask (NFC-PSM). Second, various metal oxides were directly coated on the resist patterns with low-temperature atomic layer deposition (ALD). Finally, the remaining photoresist was removed via an acetone dip, and then planar nanochannel arrays were formed on the substrate. In contrast to all the previous fabrication routes, the sub-100 nm photoresist line patterns produced by NFC-PSL are directly employed as a sacrificial layer for the creation of nanochannels. Because both the NFC-PSL and the ALD deposition are highly reproducible processes, the strategy proposed here can be regarded as a general route for nanochannel fabrication in a simplified and reliable manner. In addition, the fabricated nanochannels were used as templates to synthesize various organic and inorganic 1D nanostructures on the substrate surface.

Composition and method for removing photoresist materials from electronic components

DOEpatents

Davenhall, Leisa B.; Rubin, James B.

2002-01-01

The invention is a combination of at least one dense phase fluid and at least one dense phase fluid modifier which can be used to contact substrates for electronic parts such as semiconductor wafers or chips to remove photoresist materials which are applied to the substrates during manufacture of the electronic parts. The dense phase fluid modifier is one selected from the group of cyclic, aliphatic or alicyclic compounds having the functional group: ##STR1## wherein Y is a carbon, oxygen, nitrogen, phosphorus or sulfur atom or a hydrocarbon group having from 1 to 10 carbon atoms, a halogen or halogenated hydrocarbon group having from 1 to 10 carbon atoms, silicon or a fluorinated silicon group; and wherein R.sub.1 and R.sub.2 can be the same or different substituents; and wherein, as in the case where X is nitrogen, R.sub.1 or R.sub.2 may not be present. The invention compositions generally are applied to the substrates in a pulsed fashion in order to remove the hard baked photoresist material remaining on the surface of the substrate after removal of soft baked photoresist material and etching of the barrier layer.

Experience of Application of Liquid Lubricating Materials during Wide Strip Hot Rolling

NASA Astrophysics Data System (ADS)

Platov, S. I.; Dema, R. R.; Kharchenko, M. V.; Amirov, R. N.

2017-12-01

The paper presents the results of the scientific and practical research of roller systems operation at feed of liquid lubricating materials through the example of the wide strip hot rolling Mill-2000 at PAO MMK. The experiments proved that application of lubricating materials leads to decrease of energy-power parameters of the process by 12 to 15 %, and reduction of work roll wear by 10 to 12%. The practical results of the study are developed recommendations on determination of consumption-volumetric parameters of the supplied lubricating material depending on rheological and geometrical parameters of the rolled strip and current wear of work rolls.

Nuclear reactor fuel rod attachment system

DOEpatents

Not Available

1980-09-17

A reusable system is described for removably attaching a nuclear reactor fuel rod to a support member. A locking cap is secured to the fuel rod and a locking strip is fastened to the support member. The locking cap has two opposing fingers shaped to form a socket having a body portion. The locking strip has an extension shaped to rigidly attach to the socket's body portion. The locking cap's fingers are resiliently deflectable. For attachment, the locking cap is longitudinally pushed onto the locking strip causing the extension to temporarily deflect open the fingers to engage the socket's body portion. For removal, the process is reversed.

Estimation of line dimensions in 3D direct laser writing lithography

NASA Astrophysics Data System (ADS)

Guney, M. G.; Fedder, G. K.

2016-10-01

Two photon polymerization (TPP) based 3D direct laser writing (3D-DLW) finds application in a wide range of research areas ranging from photonic and mechanical metamaterials to micro-devices. Most common structures are either single lines or formed by a set of interconnected lines as in the case of crystals. In order to increase the fidelity of these structures and reach the ultimate resolution, the laser power and scan speed used in the writing process should be chosen carefully. However, the optimization of these writing parameters is an iterative and time consuming process in the absence of a model for the estimation of line dimensions. To this end, we report a semi-empirical analytic model through simulations and fitting, and demonstrate that it can be used for estimating the line dimensions mostly within one standard deviation of the average values over a wide range of laser power and scan speed combinations. The model delimits the trend in onset of micro-explosions in the photoresist due to over-exposure and of low degree of conversion due to under-exposure. The model guides setting of high-fidelity and robust writing parameters of a photonic crystal structure without iteration and in close agreement with the estimated line dimensions. The proposed methodology is generalizable by adapting the model coefficients to any 3D-DLW setup and corresponding photoresist as a means to estimate the line dimensions for tuning the writing parameters.

Fabrication of three-dimensional millimeter-height structures using direct ultraviolet lithography on liquid-state photoresist for simple and fast manufacturing

NASA Astrophysics Data System (ADS)

Kim, Jungkwun; Yoon, Yong-Kyu

2015-07-01

A rapid three-dimensional (3-D) ultraviolet (UV) lithography process for the fabrication of millimeter-tall high aspect ratio complex structures is presented. The liquid-state negative-tone photosensitive polyurethane, LF55GN, has been directly photopatterned using multidirectionally projected UV light for 3-D micropattern formation. The proposed lithographic scheme enabled us to overcome the maximum height obtained with a photopatternable epoxy, SU8, which has been conventionally most commonly used for the fabrication of tall and high aspect ratio microstructures. Also, the fabrication process time has been significantly reduced by eliminating photoresist-baking steps. Computer-controlled multidirectional UV lithography has been employed to fabricate 3-D structures, where the UV-exposure substrate is dynamically tilt-rotating during UV exposure to create various 3-D ray traces in the polyurethane layer. LF55GN has been characterized to provide feasible fabrication conditions for the multidirectional UV lithography. Very tall structures including a 6-mm tall triangular slab and a 5-mm tall hexablaze have been successfully fabricated. A 4.5-mm tall air-lifted polymer-core bowtie monopole antenna, which is the tallest monopole structure fabricated by photolithography and subsequent metallization, has been successfully demonstrated. The antenna shows a resonant radiation frequency of 12.34 GHz, a return loss of 36 dB, and a 10 dB bandwidth of 7%.

Determination Of Slitting Criterion Parameter During The Multi Slit Rolling Process

NASA Astrophysics Data System (ADS)

Stefanik, Andrzej; Mróz, Sebastian; Szota, Piotr; Dyja, Henryk

2007-05-01

The rolling of rods with slitting of the strip calls for the use of special mathematical models that would allow for the separating of metal. A theoretical analysis of the effect of the gap of slitting rollers on the process of band slitting during the rolling of 20 mm and 16 mm-diameter ribbed rods rolled according to the two-strand technology was carried out within this study. For the numerical modeling of strip slitting the Forge3® computer program was applied. The strip slitting in the simulation is implemented by the algorithm of removing elements in which the critical value of the normalized Cockroft - Latham criterion has been exceeded. To determine the value of the criterion the inverse method was applied. Distance between a point, where crack begins, and point of contact metal with the slitting rollers was the parameter for analysis. Power and rolling torque during slit rolling were presented. Distribution and change of the stress in strand while slitting were presented.

Fabrication of a micromold using negative PMER

NASA Astrophysics Data System (ADS)

Kwon, Young A.; Chae, Kyoung-Soo; Jeoung, Dae S.; Kim, Jong Y.; Moon, Sung

2001-10-01

We fabricated a micro mold using UV-lithography process with a novel mold material, negative PMER. Negative PMER(TOK, PMER N-CA3000) is a chemically amplified negative tone photoresist on a novolak resin base. It can be processed using standard equipment such as standard spin coater, baking with ovens or hotplates, and immersion development tools. Good quality resist patterns of up to 36μm thickness were achieved by means of this equipment in a short time. The conditions of this process were pre-exposure bake of 110 degree(s)C/12min, exposure dose of 675mJ/cm2 post-exposure bake of 100 degree(s)C/9min, and development for 10min.

Cantilevered multilevel LIGA devices and methods

DOEpatents

Morales, Alfredo Martin; Domeier, Linda A.

2002-01-01

In the formation of multilevel LIGA microstructures, a preformed sheet of photoresist material, such as polymethylmethacrylate (PMMA) is patterned by exposure through a mask to radiation, such as X-rays, and developed using a developer to remove the exposed photoresist material. A first microstructure is then formed by electroplating metal into the areas from which the photoresist has been removed. Additional levels of microstructure are added to the initial microstructure by covering the first microstructure with a conductive polymer, machining the conductive polymer layer to reveal the surface of the first microstructure, sealing the conductive polymer and surface of the first microstructure with a metal layer, and then forming the second level of structure on top of the first level structure. In such a manner, multiple layers of microstructure can be built up to allow complex cantilevered microstructures to be formed.

DEMONSTRATION OF THE NEXT-GENERATION CAUSTIC-SIDE SOLVENT EXTRACTION SOLVENT WITH 2-CM CENTRIFUGAL CONTRACTORS USING TANK 49H WASTE AND WASTE SIMULANT

DOE Office of Scientific and Technical Information (OSTI.GOV)

Pierce, R.; Peters, T.; Crowder, M.

2011-09-27

Researchers successfully demonstrated the chemistry and process equipment of the Caustic-Side Solvent Extraction (CSSX) flowsheet using MaxCalix for the decontamination of high level waste (HLW). The demonstration was completed using a 12-stage, 2-cm centrifugal contactor apparatus at the Savannah River National Laboratory (SRNL). This represents the first CSSX process demonstration of the MaxCalix solvent system with Savannah River Site (SRS) HLW. Two tests lasting 24 and 27 hours processed non-radioactive simulated Tank 49H waste and actual Tank 49H HLW, respectively. Conclusions from this work include the following. The CSSX process is capable of reducing {sup 137}Cs in high level radioactivemore » waste by a factor of more than 40,000 using five extraction, two scrub, and five strip stages. Tests demonstrated extraction and strip section stage efficiencies of greater than 93% for the Tank 49H waste test and greater than 88% for the simulant waste test. During a test with HLW, researchers processed 39 liters of Tank 49H solution and the waste raffinate had an average decontamination factor (DF) of 6.78E+04, with a maximum of 1.08E+05. A simulant waste solution ({approx}34.5 liters) with an initial Cs concentration of 83.1 mg/L was processed and had an average DF greater than 5.9E+03, with a maximum DF of greater than 6.6E+03. The difference may be attributable to differences in contactor stage efficiencies. Test results showed the solvent can be stripped of cesium and recycled for {approx}25 solvent turnovers without the occurrence of any measurable solvent degradation or negative effects from minor components. Based on the performance of the 12-stage 2-cm apparatus with the Tank 49H HLW, the projected DF for MCU with seven extraction, two scrub, and seven strip stages operating at a nominal efficiency of 90% is {approx}388,000. At 95% stage efficiency, the DF in MCU would be {approx}3.2 million. Carryover of organic solvent in aqueous streams (and aqueous in organic streams) was less than 0.1% when processing Tank 49H HLW. The entrained solvent concentration measured in the decontaminated salt solution (DSS) was as much as {approx}140 mg/L, although that value may be overstated by as much as 50% due to modifier solubility in the DSS. The entrained solvent concentration was measured in the strip effluent (SE) and the results are pending. A steady-state concentration factor (CF) of 15.9 was achieved with Tank 49H HLW. Cesium distribution ratios [D(Cs)] were measured with non-radioactive Tank 49H waste simulant and actual Tank 49H waste. Below is a comparison of D(Cs) values of ESS and 2-cm tests. Batch Extraction-Strip-Scrub (ESS) tests yielded D(Cs) values for extraction of {approx}81-88 for tests with Tank 49H waste and waste simulant. The results from the 2-cm contactor tests were in agreement with values of 58-92 for the Tank 49H HLW test and 54-83 for the simulant waste test. These values are consistent with the reference D(Cs) for extraction of {approx}60. In tests with Tank 49H waste and waste simulant, batch ESS tests measured D(Cs) values for the two scrub stages as {approx}3.5-5.0 for the first scrub stage and {approx}1.0-3.0 for the second scrub stage. In the Tank 49H test, the D(Cs) values for the 2-cm test were far from the ESS values. A D(Cs) value of 161 was measured for the first scrub stage and 10.8 for the second scrub stage. The data suggest that the scrub stage is not operating as effectively as intended. For the simulant test, a D(Cs) value of 1.9 was measured for the first scrub stage; the sample from the second scrub stage was compromised. Measurements of the pH of all stage samples for the Tank 49H test showed that the pH for extraction and scrub stages was 14 and the pH for the strip stages was {approx}7. It is expected that the pH of the second scrub stage would be {approx}12-13. Batch ESS tests measured D(Cs) values for the strip stages to be {approx}0.002-0.010. A high value in Strip No.3 of a test with simulant solution has been attributed to issues associated with the limits of detection for the analytical method. In the 2-cm contactor tests, the first four strip stages of the Tank 49H waste test and all five strip stages in the simulant waste test had higher values than the ESS tests. Only the fifth strip stage D(Cs) value of the Tank 49H waste test matched that of the ESS tests. It is speculated that the less-than-optimal performance of the strip section is caused by inefficiencies in the scrub section. Because strip is sensitive to pH, the elevated pH value in the second scrub stage may be the cause of strip performance. In spite of the D(Cs) values obtained in the scrub and strip sections, testing showed that the solvent system is robust. Average DFs for the process far exceeded targets even though the scrub and strip stages did not function optimally. Correction of the issue in the scrub and strip stages is expected to yield even higher waste DFs.« less

Medication review using a Systematic Tool to Reduce Inappropriate Prescribing (STRIP) in adults with an intellectual disability: A pilot study.

PubMed

Zaal, Rianne J; Ebbers, Susan; Borms, Mirka; Koning, Bart de; Mombarg, Erna; Ooms, Piet; Vollaard, Hans; van den Bemt, Patricia M L A; Evenhuis, Heleen M

2016-08-01

A Systematic Tool to Reduce Inappropriate Prescribing (STRIP), which includes the Screening Tool to Alert doctors to Right Treatment (START) and the Screening Tool of Older Peoples' Prescriptions (STOPP), has recently been developed in the Netherlands for older patients with polypharmacy in the general population. Active involvement of the patient is part of this systematic multidisciplinary medication review. Although annual review of pharmacotherapy is recommended for people with an intellectual disability (ID), a specific tool for this population is not yet available. Besides, active involvement can be compromised by ID. Therefore, the objective of this observational pilot study was to evaluate the process of medication review using STRIP in adults with an ID living in a centralized or dependent setting and the identification of drug-related problems using this tool. The study was performed in three residential care organizations for ID. In each organization nine clients with polypharmacy were selected by an investigator (a physician in training to become a specialized physician for individuals with an ID) for a review using STRIP. Clients as well as their legal representatives (usually a family member) and professional caregivers were invited to participate. Reviews were performed by an investigator together with a pharmacist. First, to evaluate the process time-investments of the investigator and the pharmacist were described. Besides, the proportion of reviews in which a client and/or his legal representative participated was calculated as well as the proportion of professional caregivers that participated. Second, to evaluate the identification of drug-related problems using STRIP, the proportion of clients with at least one drug-related problem was calculated. Mean time investment was 130minutes for the investigator and 90minutes for the pharmacist. The client and/or a legal representatives were present during 25 of 27 reviews (93%). All 27 professional caregivers (100%) were involved. For every client included at least one drug-related problem was identified. In total 127 drug-related problems were detected, mainly potentially inappropriate or unnecessary drugs. After six months, 15.7% of the interventions were actually implemented. Medication review using STRIP seems feasible in adults with an ID and identifies drug-related problems. However, in this pilot study the implementation rate of suggested interventions was low. To improve the implementation rate, the treating physician should be involved in the review process. Besides, specific adaptations to STRIP to address drug-related problems specific for this population are required. Copyright © 2016 Elsevier Ltd. All rights reserved.

Analytical techniques for mechanistic characterization of EUV photoresists

NASA Astrophysics Data System (ADS)

Grzeskowiak, Steven; Narasimhan, Amrit; Murphy, Michael; Ackerman, Christian; Kaminsky, Jake; Brainard, Robert L.; Denbeaux, Greg

2017-03-01

Extreme ultraviolet (EUV, 13.5 nm) lithography is the prospective technology for high volume manufacturing by the microelectronics industry. Significant strides towards achieving adequate EUV source power and availability have been made recently, but a limited rate of improvement in photoresist performance still delays the implementation of EUV. Many fundamental questions remain to be answered about the exposure mechanisms of even the relatively well understood chemically amplified EUV photoresists. Moreover, several groups around the world are developing revolutionary metal-based resists whose EUV exposure mechanisms are even less understood. Here, we describe several evaluation techniques to help elucidate mechanistic details of EUV exposure mechanisms of chemically amplified and metal-based resists. EUV absorption coefficients are determined experimentally by measuring the transmission through a resist coated on a silicon nitride membrane. Photochemistry can be evaluated by monitoring small outgassing reaction products to provide insight into photoacid generator or metal-based resist reactivity. Spectroscopic techniques such as thin-film Fourier transform infrared (FTIR) spectroscopy can measure the chemical state of a photoresist system pre- and post-EUV exposure. Additionally, electrolysis can be used to study the interaction between photoresist components and low energy electrons. Collectively, these techniques improve our current understanding of photomechanisms for several EUV photoresist systems, which is needed to develop new, better performing materials needed for high volume manufacturing.

Frictional interactions in forming processes: New studies with transparent sapphire strip-drawing dies

NASA Astrophysics Data System (ADS)

Rao, R. S.; Lu, C. Y.; Wright, P. K.; Devenpeck, M. L.; Richmond, O.; Appleby, E. J.

1982-05-01

This research is concerned with the frictional interactions at the toolwork interfaces in the machining and strip-drawing processes. A novel feature is that transparent sapphire (single crystal Al2O3) is being used as the tool and die material. This allows the tribological features of the interface to be directly observed and recorded on movie-film. These qualitative studies provide information on the role of lubricants. In addition, techniques are being developed to quantify the velocity gradient along the interface. For example, in the drawing work it has been found that tracer markings (e.g. dye-spots), applied to the undrawn strip, remain intact during drawing and can be tracked along the sapphire/strip interface. Such data will be used as input to a finite-element, elasto-plastic-workhardening model of the deformation process. The latter can compute strip deformation characteristics, drawing forces and local coefficients of friction at the interface. Introductory results will be presented in this paper, obtained from drawing tin-plated mild steel with sapphire and cemented carbide dies. Drawing loads and die-separating forces will be presented and movie-films of the action of tracer markings at the interface shown. In order to demonstrate how this data can be used in an analysis of a large strain deformation process with friction, initial results from running the FIPDEF elasto-plastic code will be discussed. From a commercial viewpoint research on strip-drawing is of special interest to the can-making industry. From a physical viewpoint stripdrawing is of particular interest because it is a symmetrical, plane strain deformation and, in comparison with other metal processing operations, it is more readily modeled. However, until now the elasto-plastic codes that have been developed to predictively model drawing have had limitations: the most notable being that of quantifying the friction conditions at the die-work interface. Hence the specification of the latter is the ultimate goal of this research program.

A novel ultra-low carbon grain oriented silicon steel produced by twin-roll strip casting

NASA Astrophysics Data System (ADS)

Wang, Yang; Zhang, Yuan-Xiang; Lu, Xiang; Fang, Feng; Xu, Yun-Bo; Cao, Guang-Ming; Li, Cheng-Gang; Misra, R. D. K.; Wang, Guo-Dong

2016-12-01

A novel ultra-low carbon grain oriented silicon steel was successfully produced by strip casting and two-stage cold rolling method. The microstructure, texture and precipitate evolution under different first cold rolling reduction were investigated. It was shown that the as-cast strip was mainly composed of equiaxed grains and characterized by very weak Goss texture ({110}<001>) and λ-fiber (<001>//ND). The coarse sulfides of size 100 nm were precipitated at grain boundaries during strip casting, while nitrides remained in solution in the as-cast strip and the fine AlN particles of size 20-50 nm, which were used as grain growth inhibitors, were formed in intermediate annealed sheet after first cold rolling. In addition, the suitable Goss nuclei for secondary recrystallization were also formed during intermediate annealing, which is totally different from the conventional process that the Goss nuclei originated in the subsurface layer of the hot rolled sheet. Furthermore, the number of AlN inhibitors and the intensity of desirable Goss texture increased with increasing first cold rolling reduction. After secondary recrystallization annealing, very large grains of size 10-40 mm were formed and the final magnetic induction, B8, was as high as 1.9 T.

Fluorine-containing composition for forming anti-reflection film on resist surface and pattern formation method

DOEpatents

Nishi, Mineo; Makishima, Hideo

1996-01-01

A composition for forming anti-reflection film on resist surface which comprises an aqueous solution of a water soluble fluorine compound, and a pattern formation method which comprises the steps of coating a photoresist composition on a substrate; coating the above-mentioned composition for forming anti-reflection film; exposing the coated film to form a specific pattern; and developing the photoresist, are provided. Since the composition for forming anti-reflection film can be coated on the photoresist in the form of an aqueous solution, not only the anti-reflection film can be formed easily, but also, the film can be removed easily by rinsing with water or alkali development. Therefore, by the pattern formation method according to the present invention, it is possible to form a pattern easily with a high dimensional accuracy.

Acoustic-wave sensor for ambient monitoring of a photoresist-stripping agent

DOEpatents

Pfeifer, Kent B.; Hoyt, Andrea E.; Frye, Gregory C.

1998-01-01

The acoustic-wave sensor. The acoustic-wave sensor is designed for ambient or vapor-phase monitoring of a photoresist-stripping agent such as N-methylpyrrolidinone (NMP), ethoxyethylpropionate (EEP) or the like. The acoustic-wave sensor comprises an acoustic-wave device such as a surface-acoustic-wave (SAW) device, a flexural-plate-wave (FPW) device, an acoustic-plate-mode (APM) device, or a thickness-shear-mode (TSM) device (also termed a quartz crystal microbalance or QCM) having a sensing region on a surface thereof. The sensing region includes a sensing film for sorbing a quantity of the photoresist-stripping agent, thereby altering or shifting a frequency of oscillation of an acoustic wave propagating through the sensing region for indicating an ambient concentration of the agent. According to preferred embodiments of the invention, the acoustic-wave device is a SAW device; and the sensing film comprises poly(vinylacetate), poly(N-vinylpyrrolidinone), or poly(vinylphenol).

M3: Microscope-based maskless micropatterning with dry film photoresist

PubMed Central

Leigh, Steven Y.; Tattu, Aashay; Mitchell, Joseph S. B.

2011-01-01

We present a maskless micropatterning system that utilizes a fluorescence microscope with programmable X-Y stage and dry film photoresist to realize feature sizes in the sub-millimeter range (40–700 μm). The method allows for flexible in-house maskless photolithography without a dedicated microfabrication facility and is well-suited for rapid prototyping of microfluidic channels, scaffold templates for protein/cell patterning or optically-guided cell encapsulation for biomedical applications. PMID:21190086

Nuclear reactor fuel rod attachment system

DOEpatents

Christiansen, David W.

1982-01-01

A reusable system for removably attaching a nuclear reactor fuel rod (12) to a support member (14). A locking cap (22) is secured to the fuel rod (12) and a locking strip (24) is fastened to the support member (14). The locking cap (22) has two opposing fingers (24a and 24b) shaped to form a socket having a body portion (26). The locking strip has an extension (36) shaped to rigidly attach to the socket's body portion (26). The locking cap's fingers are resiliently deflectable. For attachment, the locking cap (22) is longitudinally pushed onto the locking strip (24) causing the extension (36) to temporarily deflect open the fingers (24a and 24b) to engage the socket's body portion (26). For removal, the process is reversed.

Method and apparatus for planar drag strip casting

DOEpatents

Powell, J.C.; Campbell, S.L.

1991-11-12

The present invention is directed to an improved process and apparatus for strip casting. The combination of a planar flow casting nozzle positioned back from the top dead center position with an attached nozzle extension, provides an increased level of casting control and quality. The nozzle extension provides a means of containing the molten pool above the rotating substrate to increase the control of molten metal at the edges of the strip and increase the range of coating thicknesses which may be produced. The level of molten metal in the containment means is regulated to be above the level of melt supplying the casting nozzle which produces a condition of planar drag flow with the casting substrate prior to solidification. 5 figures.

Universal control and measuring system for modern classic and amorphous magnetic materials single/on-line strip testers

NASA Astrophysics Data System (ADS)

Zemánek, Ivan; Havlíček, Václav

2006-09-01

A new universal control and measuring system for classic and amorphous soft magnetic materials single/on-line strip testing has been developed at the Czech Technical University in Prague. The measuring system allows to measure magnetization characteristic and specific power losses of different tested materials (strips) at AC magnetization of arbitrary magnetic flux density waveform at wide range of frequencies 20 Hz-20 kHz. The measuring system can be used for both single strip testing in laboratories and on-line strip testing during the production process. The measuring system is controlled by two-stage master-slave control system consisting of the external PC (master) completed by three special A/D measuring plug-in boards, and local executing control unit (slave) with one-chip microprocessor 8051, connected with PC by the RS232 serial line. The "user friendly" powerful control software implemented on the PC and the effective program code for the microprocessor give possibility for full automatic measurement with high measuring power and high measuring accuracy.

A novel method to fabricate silicon tubular gratings with broadband antireflection and super-hydrophobicity.

PubMed

Gao, Yang; Shi, Tielin; Tan, Xianhua; Liao, Guanglan

2014-06-01

We have developed a novel method to fabricate micro/nano structure based on the coherent diffraction lithography, and acquired periodic silicon tubular gratings with deep nano-scale tapered profiles at the top part. The optical properties of these tubular gratings were similar to an effective gradient-index antireflective surface, resulting in a broadband antireflective combining super-hydrophobic behavior. The mechanism of the method was simulated by rigorous coupled wave analysis algorithms. Then coherent diffraction lithography by use of suitable mask, in which periodic micro-scale circular opaque patters were distributed, was realized on the traditional aligner. Due to coherent diffraction, we obtained enough light intensity for photoresist exposure under the center of the opaque area in the mask together with transparent areas. The tapered line profiles and hollow photoresist gratings over large areas could be fabricated on the silicon wafer after development. The dry etching process was carried out, and high aspect ratio silicon tubular gratings with deep tapered profiles at the top were fabricated. The optical property and wettability of the structure were verified, proving that the proposed method and obtained micro/nano structure provide application potential in the future.

Capabilities of ICP-RIE cryogenic dry etching of silicon: review of exemplary microstructures

NASA Astrophysics Data System (ADS)

Sökmen, Ü.; Stranz, A.; Fündling, S.; Wehmann, H.-H.; Bandalo, V.; Bora, A.; Tornow, M.; Waag, A.; Peiner, E.

2009-10-01

Inductively coupled plasma (ICP) cryogenic dry etching was used to etch submicron pores, nano contact lines, submicron diameter pillars, thin and thick cantilevers, membrane structures and anisotropic deep structures with high aspect ratios in silicon for bio-nanoelectronics, optoelectronics and nano-micro electromechanical systems (NMEMS). The ICP cryogenic dry etching gives us the advantage of switching plasmas between etch rates of 13 nm min-1 and 4 µm min-1 for submicron pores and for membrane structures, respectively. A very thin photoresist mask can endure at -75 °C even during etching 70 µm deep for cantilevers and 300 µm deep for membrane structures. Coating the backsides of silicon membrane substrates with a thin photoresist film inhibited the lateral etching of cantilevers during their front release. Between -95 °C and -140 °C, we realized crystallographic-plane-dependent etching that creates facets only at the etch profile bottom. By varying the oxygen content and the process temperature, we achieved good control over the shape of the etched structures. The formation of black silicon during membrane etching down to 300 µm was delayed by reducing the oxygen content.

Method and apparatus for planar drag strip casting

DOEpatents

Powell, John C.; Campbell, Steven L.

1991-01-01

The present invention is directed to an improved process and apparatus for strip casting. The combination of a planar flow casting nozzle positioned back from the top dead center position with an attached nozzle extension, provides an increased level of casting control and quality. The nozzle extension provides a means of containing the molten pool above the rotating substrate to increase the control of molten metal at the edges of the strip and increase the range of coating thicknesses which may be produced. The level of molten metal in the containment means is regulated to be above the level of melt supplying the casting nozzle which produces a condition of planar drag flow with the casting substrate prior to solidification.

Photoresist and stochastic modeling

NASA Astrophysics Data System (ADS)

Hansen, Steven G.

2018-01-01

Analysis of physical modeling results can provide unique insights into extreme ultraviolet stochastic variation, which augment, and sometimes refute, conclusions based on physical intuition and even wafer experiments. Simulations verify the primacy of "imaging critical" counting statistics (photons, electrons, and net acids) and the image/blur-dependent dose sensitivity in describing the local edge or critical dimension variation. But the failure of simple counting when resist thickness is varied highlights a limitation of this exact analytical approach, so a calibratable empirical model offers useful simplicity and convenience. Results presented here show that a wide range of physical simulation results can be well matched by an empirical two-parameter model based on blurred image log-slope (ILS) for lines/spaces and normalized ILS for holes. These results are largely consistent with a wide range of published experimental results; however, there is some disagreement with the recently published dataset of De Bisschop. The present analysis suggests that the origin of this model failure is an unexpected blurred ILS:dose-sensitivity relationship failure in that resist process. It is shown that a photoresist mechanism based on high photodecomposable quencher loading and high quencher diffusivity can give rise to pitch-dependent blur, which may explain the discrepancy.

Formalin produces depolarizations in human airway smooth muscle in vitro.

PubMed

Richards, Ira S; DeHate, Robin B

2006-03-01

Respiratory irritants may result in airway smooth muscle (ASM) depolarization and bronchoconstriction. We examined the effect of formalin on membrane potentials in human ASM in two types of in vitro preparations: strip preparations, which contain functional sensory and motor nerve endings and cultured cells, which lack these nerve endings due to the tissue dissociation process. Depolarizations occurred in atropine-treated strip preparations in response to formalin exposures, but not in similarly-treated cultured cells, suggesting a role for non-cholinergic mediators in formalin-induced depolarization. It is suggested that formalin may act as an irritant to produce bronchoconstriction that is mediated by the release of endogenous substance P (SP) from peripheral sensory nerve endings. This is supported by our observation that exogenous SP produced depolarizations of a magnitude similar to those produced by formalin in both strip preparations and cultured cells. In addition, capsaicin, which releases endogenous SP from nerve endings, produced depolarizations of a magnitude similar to formalin in strip preparations, but was without effect in cultured cells.

Acoustic-wave sensor for ambient monitoring of a photoresist-stripping agent

DOEpatents

Pfeifer, K.B.; Hoyt, A.E.; Frye, G.C.

1998-08-18

The acoustic-wave sensor is disclosed. The acoustic-wave sensor is designed for ambient or vapor-phase monitoring of a photoresist-stripping agent such as N-methylpyrrolidinone (NMP), ethoxyethylpropionate (EEP) or the like. The acoustic-wave sensor comprises an acoustic-wave device such as a surface-acoustic-wave (SAW) device, a flexural-plate-wave (FPW) device, an acoustic-plate-mode (APM) device, or a thickness-shear-mode (TSM) device (also termed a quartz crystal microbalance or QCM) having a sensing region on a surface thereof. The sensing region includes a sensing film for sorbing a quantity of the photoresist-stripping agent, thereby altering or shifting a frequency of oscillation of an acoustic wave propagating through the sensing region for indicating an ambient concentration of the agent. According to preferred embodiments of the invention, the acoustic-wave device is a SAW device; and the sensing film comprises poly(vinylacetate), poly(N-vinylpyrrolidinone), or poly(vinylphenol). 3 figs.

Laser Structuring of Thin Layers for Flexible Electronics by a Shock Wave-induced Delamination Process

NASA Astrophysics Data System (ADS)

Lorenz, Pierre; Ehrhardt, Martin; Zimmer, Klaus

The defect-free laser-assisted structuring of thin films on flexible substrates is a challenge for laser methods. However, solving this problem exhibits an outstanding potential for a pioneering development of flexible electronics. Thereby, the laser-assisted delamination method has a great application potential. At the delamination process: the localized removal of the layer is induced by a shock wave which is produced by a laser ablation process on the rear side of the substrate. In this study, the thin-film patterning process is investigated for different polymer substrates dependent on the material and laser parameters using a KrF excimer laser. The resultant structures were studied by optical microscopy and white light interferometry (WLI). The delamination process was tested at different samples (indium tin oxide (ITO) on polyethylene terephthalate (PET), epoxy-based negative photoresist (SU8) on polyimide (PI) and indium tin oxide/copper indium gallium selenide/molybdenum (ITO/CIGS/Mo) on PI.

Maskless lithography using off-the-shelf inkjet printer

NASA Astrophysics Data System (ADS)

Seng, Leo Cheng; Chollet, Franck

2006-12-01

Photolithography is the most important process used to pattern the surface of silicon wafers in IC fabrication. It has shown high performance but its use is not cost-effective for small series or prototyping as it necessitates a costly infrastructure (mask aligner) and requires the fabrication of masks which can be expensive and timeconsuming. Recently, the high resolution achieved by ink-jet printer (> 1200 DPI) starts to make an interesting alternative to obtain a patterned protective layer instead of using photolithography. This is particularly true for MEMS which often need a resolution of only 10 to 20 μm. After studying the different architecture of inkjet printer available in the market, a commercial S$100-printer was selected and modified to allow printing on a rigid silicon wafer. We then developed three different patterning processes using the printer. In a first process the ink was directly used as a protective layer for patterning. A second process modified the photolithography by using the printed ink as a photo-mask on a spun layer of photoresist. In each case we had to modify the surface energy of the wafer by surface treatment to improve the resolution. Finally we replaced the ink with a modified photoresist solution and directly printed a protective mask onto the wafer. Design of Experiment (DOE) methods were systematically employed to study the main and interaction effects of the parameters on the lithography and on the pattern transfer. The series of experiment showed that off-the-shelf ink-jet printer could be used easily for pattern with a resolution below 50 μm, but could not yet reach the 20 μm range.

Non-noble metal based metallization systems

NASA Technical Reports Server (NTRS)

Garcia, A., III

1983-01-01

The results of efforts to produce a nonsilver metallization system for silicon photovoltaic cells are given. The system uses a metallization system based on molybdenum, tin, and titanium hydride. The initial work in this system was done using the MIDFILM process. The MIDFILM process attains a line resolution comparable to photoresist methods with a process related to screen printing. The surface to be processed is first coated with a thin layer of photopolymer material. Upon exposure to ultraviolet light through a suitable mask, the polymer in the non-pattern area crosslinks and becomes hard. The unexposed pattern areas remain tacky. The conductor material is then applied in the form of a dry mixture of metal which adheres to the tacky pattern area. The assemblage is then fired to ash the photopolymer and sinter the conductor powder.

Semiconductor technology program. Progress briefs

NASA Technical Reports Server (NTRS)

Bullis, W. M. (Editor)

1979-01-01

The current status of NBS work on measurement technology for semiconductor materials, process control, and devices is reported. Results of both in-house and contract research are covered. Highlighted activities include modeling of diffusion processes, analysis of model spreading resistance data, and studies of resonance ionization spectroscopy, resistivity-dopant density relationships in p-type silicon, deep level measurements, photoresist sensitometry, random fault measurements, power MOSFET thermal characteristics, power transistor switching characteristics, and gross leak testing. New and selected on-going projects are described. Compilations of recent publications and publications in press are included.

Phosphorus doping a semiconductor particle

DOEpatents

Stevens, G.D.; Reynolds, J.S.

1999-07-20

A method of phosphorus doping a semiconductor particle using ammonium phosphate is disclosed. A p-doped silicon sphere is mixed with a diluted solution of ammonium phosphate having a predetermined concentration. These spheres are dried with the phosphorus then being diffused into the sphere to create either a shallow or deep p-n junction. A good PSG glass layer is formed on the surface of the sphere during the diffusion process. A subsequent segregation anneal process is utilized to strip metal impurities from near the p-n junction into the glass layer. A subsequent HF strip procedure is then utilized to removed the PSG layer. Ammonium phosphate is not a restricted chemical, is inexpensive, and does not pose any special shipping, handling, or disposal requirement. 1 fig.

Phosphorous doping a semiconductor particle

DOEpatents

Stevens, Gary Don; Reynolds, Jeffrey Scott

1999-07-20

A method (10) of phosphorus doping a semiconductor particle using ammonium phosphate. A p-doped silicon sphere is mixed with a diluted solution of ammonium phosphate having a predetermined concentration. These spheres are dried (16, 18), with the phosphorus then being diffused (20) into the sphere to create either a shallow or deep p-n junction. A good PSG glass layer is formed on the surface of the sphere during the diffusion process. A subsequent segregation anneal process is utilized to strip metal impurities from near the p-n junction into the glass layer. A subsequent HF strip procedure is then utilized to removed the PSG layer. Ammonium phosphate is not a restricted chemical, is inexpensive, and does not pose any special shipping, handling, or disposal requirement.

Interplay among Coating Thickness, Strip Size, and Thermal and Solidification Characteristics in A356 Lost Foam Casting Alloy

NASA Astrophysics Data System (ADS)

Shabestari, S. G.; Divandari, M.; Ghoncheh, M. H.; Jamali, V.

2017-10-01

The aim of this research was evaluation of the solidification parameters of A356 alloy, e.g., dendrite arm spacing (DAS), correlation between cooling rate (CR) and DAS, hot tearing, and microstructural analysis at different coating thicknesses and strip sizes during the lost foam casting process (LFC). To achieve this goal, the DAS was measured at six coating thicknesses and six different strip sizes. In addition, thermal characteristics, such as the CR, temperatures of start and finish points of solidification, recalescence undercooling, and hot tearing susceptibility (HCSC), at five coating thicknesses were recognized from the cooling curves and their first derivative and the solid fraction curves, which have been plotted through the thermal analysis technique. The pouring temperature and strip size were fixed at 1063 K (790 °C) and 12 mm, respectively. Besides, to derive a numerical equation to predict the CR by measuring the DAS in this alloy, a microstructural evaluation was carried out on samples cast through 12-mm strip size. The results showed that both coating thickness and strip size had similar influences on the DAS, in which, by retaining one parameter at a constant value and simultaneous enhancement in the other parameter, the DAS increased significantly. Furthermore, at thinner coating layer, the higher amount of the CR was observed, which caused reduction in the temperatures of both the start and finish points of solidification. Also, increasing the CR caused a nonlinear increase in both the recalescence undercooling and the HCSC.

Dependence of absolute photon flux on infrared absorbance alteration and surface roughness on photoresist polymers irradiated with vacuum ultraviolet photons emitted from HBr plasma

NASA Astrophysics Data System (ADS)

Zhang, Yan; Takeuchi, Takuya; Ishikawa, Kenji; Hayashi, Toshio; Takeda, Keigo; Sekine, Makoto; Hori, Masaru

2017-12-01

The absolute fluxes of vacuum ultraviolet (VUV) photons emitted from HBr plasma were analyzed and the effects of VUV photons on a photoresist polymer in ArF-excimer-laser (193 nm) lithography were quantitatively investigated on the basis of the infrared spectra attributed to the C=O region. The spectral peak intensity assigned to the methacrylic acid (MAA) in the photoresist drastically decreased owing to the loss of this monomer caused by the irradiation of VUV photons at dosages below 16 × 1016 photons/cm2. X-ray photoelectron spectroscopy observation showed that the removed monomer moved to the surface and generated volatile products that induced a decrease in film thickness. As a consequence, the surface became rough during the early-stage irradiation at dosages lower than 16 × 1016 photons/cm2 owing to the monomer loss of MAA with volatile product formation and subsequent cross-linking reactions.

Inductively coupled plasma etching of GaAs low loss waveguides for a traveling waveguide polarization converter, using chlorine chemistry

NASA Astrophysics Data System (ADS)

Lu, J.; Meng, X.; Springthorpe, A. J.; Shepherd, F. R.; Poirier, M.

2004-05-01

A traveling waveguide polarization converter [M. Poirier et al.] has been developed, which involves long, low loss, weakly confined waveguides etched in GaAs (epitaxially grown by molecular beam epitaxy), with electroplated ``T electrodes'' distributed along the etched floor adjacent to the ridge walls, and airbridge interconnect metallization. This article describes the development of the waveguide fabrication, based on inductively coupled plasma (ICP) etching of GaAs using Cl2 chemistry; the special processes required to fabricate the electrodes and metallization [X. Meng et al.], and the device characteristics [M. Poirier et al.], are described elsewhere. The required waveguide has dimensions nominally 4 μm wide and 2.1 μm deep, with dimensional tolerances ~0.1 μm across the wafer and wafer to wafer. A vertical etch profile with very smooth sidewalls and floors is required to enable the plated metal electrodes to be fabricated within 0.1 μm of the ridge. The ridges were fabricated using Cl2 ICP etching and a photoresist mask patterned with an I-line stepper; He backside cooling, combined with an electrostatic chuck, was employed to ensure good heat transfer to prevent resist reticulation. The experimental results showed that the ridge profile is very sensitive to ICP power and platen rf power. High ICP power and low platen power tend to result in more isotropic etching, whereas increasing platen power increases the photoresist etch rate, which causes rougher ridge sidewalls. No strong dependence of GaAs etch rate and ridge profile were observed with small changes in process temperature (chuck temperature). However, when the chuck temperature was decreased from 25 to 0 °C, etch uniformity across a 3 in. wafer improved from 6% to 3%. Photoresist and polymer residues present after the ICP etch were removed using a combination of wet and dry processes. .

Gold-coated polydimethylsiloxane microwells for high-throughput electrochemiluminescence analysis of intracellular glucose at single cells.

PubMed

Xia, Juan; Zhou, Junyu; Zhang, Ronggui; Jiang, Dechen; Jiang, Depeng

2018-06-04

In this communication, a gold-coated polydimethylsiloxane (PDMS) chip with cell-sized microwells was prepared through a stamping and spraying process that was applied directly for high-throughput electrochemiluminescence (ECL) analysis of intracellular glucose at single cells. As compared with the previous multiple-step fabrication of photoresist-based microwells on the electrode, the preparation process is simple and offers fresh electrode surface for higher luminescence intensity. More luminescence intensity was recorded from cell-retained microwells than that at the planar region among the microwells that was correlated with the content of intracellular glucose. The successful monitoring of intracellular glucose at single cells using this PDMS chip will provide an alternative strategy for high-throughput single-cell analysis. Graphical abstract ᅟ.

Lost Mold Rapid Infiltration Forming of Mesoscale Ceramics: Part 1, Fabrication

PubMed Central

Antolino, Nicholas E.; Hayes, Gregory; Kirkpatrick, Rebecca; Muhlstein, Christopher L.; Frecker, Mary I.; Mockensturm, Eric M.; Adair, James H.

2009-01-01

Free-standing mesoscale (340 μm × 30 μm × 20 μm) bend bars with an aspect ratio over 15:1 and an edge resolution as fine as a single grain diameter (∼400 nm) have been fabricated in large numbers on refractory ceramic substrates by combining a novel powder processing approach with photoresist molds and an innovative lost-mold thermal process. The colloid and interfacial chemistry of the nanoscale zirconia particulates has been modeled and used to prepare highly concentrated suspensions. Engineering solutions to challenges in mold fabrication and casting have yielded free-standing, crack-free parts. Molds are fabricated using high-aspect-ratio photoresist on ceramic substrates. Green parts are formed using a rapid infiltration method that exploits the shear thinning behavior of the highly concentrated ceramic suspension in combination with gelcasting. The mold is thermally decomposed and the parts are sintered in place on the ceramic substrate. Chemically aided attrition milling disperses and concentrates the as-received 3Y-TZP powder to produce a dense, fine-grained sintered microstructure. Initial three-point bend strength data are comparable to that of conventional zirconia; however, geometric irregularities (e.g., trapezoidal cross sections) are present in this first generation and are discussed with respect to the distribution of bend strength. PMID:19809595

Integration of multiple theories for the simulation of laser interference lithography processes

NASA Astrophysics Data System (ADS)

Lin, Te-Hsun; Yang, Yin-Kuang; Fu, Chien-Chung

2017-11-01

The periodic structure of laser interference lithography (LIL) fabrication is superior to other lithography technologies. In contrast to traditional lithography, LIL has the advantages of being a simple optical system with no mask requirements, low cost, high depth of focus, and large patterning area in a single exposure. Generally, a simulation pattern for the periodic structure is obtained through optical interference prior to its fabrication through LIL. However, the LIL process is complex and combines the fields of optical and polymer materials; thus, a single simulation theory cannot reflect the real situation. Therefore, this research integrates multiple theories, including those of optical interference, standing waves, and photoresist characteristics, to create a mathematical model for the LIL process. The mathematical model can accurately estimate the exposure time and reduce the LIL process duration through trial and error.

Integration of multiple theories for the simulation of laser interference lithography processes.

PubMed

Lin, Te-Hsun; Yang, Yin-Kuang; Fu, Chien-Chung

2017-11-24

The periodic structure of laser interference lithography (LIL) fabrication is superior to other lithography technologies. In contrast to traditional lithography, LIL has the advantages of being a simple optical system with no mask requirements, low cost, high depth of focus, and large patterning area in a single exposure. Generally, a simulation pattern for the periodic structure is obtained through optical interference prior to its fabrication through LIL. However, the LIL process is complex and combines the fields of optical and polymer materials; thus, a single simulation theory cannot reflect the real situation. Therefore, this research integrates multiple theories, including those of optical interference, standing waves, and photoresist characteristics, to create a mathematical model for the LIL process. The mathematical model can accurately estimate the exposure time and reduce the LIL process duration through trial and error.

Container lid gasket protective strip for double door transfer system

DOEpatents

Allen, Jr., Burgess M

2013-02-19

An apparatus and a process for forming a protective barrier seal along a "ring of concern" of a transfer container used with double door systems is provided. A protective substrate is supplied between a "ring of concern" and a safety cover in which an adhesive layer of the substrate engages the "ring of concern". A compressive foam strip along an opposite side of the substrate engages a safety cover such that a compressive force is maintained between the "ring of concern" and the adhesive layer of the substrate.

Data-based hybrid tension estimation and fault diagnosis of cold rolling continuous annealing processes.

PubMed

Liu, Qiang; Chai, Tianyou; Wang, Hong; Qin, Si-Zhao Joe

2011-12-01

The continuous annealing process line (CAPL) of cold rolling is an important unit to improve the mechanical properties of steel strips in steel making. In continuous annealing processes, strip tension is an important factor, which indicates whether the line operates steadily. Abnormal tension profile distribution along the production line can lead to strip break and roll slippage. Therefore, it is essential to estimate the whole tension profile in order to prevent the occurrence of faults. However, in real annealing processes, only a limited number of strip tension sensors are installed along the machine direction. Since the effects of strip temperature, gas flow, bearing friction, strip inertia, and roll eccentricity can lead to nonlinear tension dynamics, it is difficult to apply the first-principles induced model to estimate the tension profile distribution. In this paper, a novel data-based hybrid tension estimation and fault diagnosis method is proposed to estimate the unmeasured tension between two neighboring rolls. The main model is established by an observer-based method using a limited number of measured tensions, speeds, and currents of each roll, where the tension error compensation model is designed by applying neural networks principal component regression. The corresponding tension fault diagnosis method is designed using the estimated tensions. Finally, the proposed tension estimation and fault diagnosis method was applied to a real CAPL in a steel-making company, demonstrating the effectiveness of the proposed method.

Vectorization and parallelization of the finite strip method for dynamic Mindlin plate problems

NASA Technical Reports Server (NTRS)

Chen, Hsin-Chu; He, Ai-Fang

1993-01-01

The finite strip method is a semi-analytical finite element process which allows for a discrete analysis of certain types of physical problems by discretizing the domain of the problem into finite strips. This method decomposes a single large problem into m smaller independent subproblems when m harmonic functions are employed, thus yielding natural parallelism at a very high level. In this paper we address vectorization and parallelization strategies for the dynamic analysis of simply-supported Mindlin plate bending problems and show how to prevent potential conflicts in memory access during the assemblage process. The vector and parallel implementations of this method and the performance results of a test problem under scalar, vector, and vector-concurrent execution modes on the Alliant FX/80 are also presented.

Advanced lithographic filtration and contamination control for 14nm node and beyond semiconductor processes

NASA Astrophysics Data System (ADS)

Varanasi, Rao; Mesawich, Michael; Connor, Patrick; Johnson, Lawrence

2017-03-01

Two versions of a specific 2nm rated filter containing filtration medium and all other components produced from high density polyethylene (HDPE), one subjected to standard cleaning, the other to specialized ultra-cleaning, were evaluated in terms of their cleanliness characteristics, and also defectivity of wafers processed with photoresist filtered through each. With respect to inherent cleanliness, the ultraclean version exhibited a 70% reduction in total metal extractables and 90% reduction in organics extractables compared to the standard clean version. In terms of particulate cleanliness, the ultraclean version achieved stability of effluent particles 30nm and larger in about half the time required by the standard clean version, also exhibiting effluent levels at stability almost 90% lower. In evaluating defectivity of blanket wafers processed with photoresist filtered through either version, initial defect density while using the ultraclean version was about half that observed when the standard clean version was in service, with defectivity also falling more rapidly during subsequent usage of the ultraclean version compared to the standard clean version. Similar behavior was observed for patterned wafers, where the enhanced defect reduction was primarily of bridging defects. The filter evaluation and actual process-oriented results demonstrate the extreme value in using filtration designed possessing the optimal intrinsic characteristics, but with further improvements possible through enhanced cleaning processes

Glove permeation by semiconductor processing mixtures containing glycol-ether derivatives.

PubMed

Zellers, E T; Ke, H Q; Smigiel, D; Sulewski, R; Patrash, S J; Han, M W; Zhang, G Z

1992-02-01

Results of permeation tests of several glove materials challenged with semiconductor processing formulations containing glycolether derivatives are described. Commercial glove samples of nitrile rubber (Edmont), natural rubber (Edmont and Baxter), butyl rubber (North), PVC Baxter), a natural rubber/neoprene/nitrile blend (Pioneer), and a natural rubber/neoprene blend (Playtex) were tested according to the ASTM F739-85 permeation test method (open-loop configuration). The liquid formulations examined included a positive photoresist thinner containing 2-ethoxyethyl acetate (2-EEA), n-butyl acetate, and xylene; a positive photoresist containing 2-EEA, n-butyl acetate, xylene, polymer resins, and photoactive compounds; a negative photoresist containing 2-methoxyethanol (2-ME), xylene, and cyclized poly(isoprene); and pure 2-methoxyethyl acetate (2-MEA), which is the solvent used in a commercial electron-beam resist. With the exception of the negative photoresist, butyl rubber provided the highest level of protection against the solvent mixtures tested, with no breakthrough observed after 4 hr of continuous exposure at 25 degrees C. Nitrile rubber provided the highest level of protection against the negative photoresist and reasonably good protection against initial exposure to the other solvent mixtures. Gloves consisting of natural rubber or natural rubber blends provided less protection against the mixtures than either nitrile or butyl rubber. For most of the glove samples, permeation of the glycol-ether derivatives contained in the mixtures was faster than that predicted from the permeation of the pure solvents. Increasing the exposure temperature from 25 to 37 degrees C did not significantly affect the performance of the butyl rubber glove. For the other gloves, however, exposures at 37 degrees C resulted in decreases in breakthrough times of 25-75% and increases in steady-state permeation rates of 80-457% relative to values obtained at 25 degrees C. Repeated exposure of nitrile rubber samples resulted in shorter breakthrough times for all mixture components. In fact, exposure for as little as one-half of the nominal breakthrough time followed by air drying overnight resulted in measurable quantities of one or more of the component solvents at the inner surface of the gloves at the beginning of the next exposure. This effect was not observed with the butyl rubber samples. With the exception of the negative photoresist, heating previously exposed nitrile rubber samples at 70 degrees C for 20 hr prior to retesting reduced or eliminated the effects of residual solvents, permitting reuse of the gloves. The use of thin PVC or natural rubber gloves adjacent to the nitrile gloves provided moderate increases in permeation resistance.(ABSTRACT TRUNCATED AT 400 WORDS)

Technical and economic advantages of making lead-acid battery grids by continuous electroforming

NASA Astrophysics Data System (ADS)

Warlimont, H.; Hofmann, T.

A new continuous electroforming process to manufacture lead grids for automotive and industrial lead-acid batteries has been developed. A galvanic cell comprising a drum cathode for electroforming and a subsequent series of galvanic cells which form a strip galvanizing line are operating in a single, fully continuous, automatic process. Virgin lead or lead scrap may be used as the anode material. The product is grid strip of any specified thickness and design which can be fed into existing strip-pasting equipment. The composition and microstructure of the grid material can be varied to provide increased corrosion resistance and increased paste adherence. A unique feature of the material is its inherent layered composite structure that allows optimization of the properties according to particular functional requirements. Thus, both the specific power and the specific energy of the battery can be increased by reducing weight. The material properties increase the calendar life of the battery by increasing the corrosion resistance of the grid, and increase the cycle-life of the battery by improved adherence of the positive active material. The technical and economic features and competitive advantages of this new technology and product are presented in quantitative terms.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sharma, Rabindar K., E-mail: rkrksharma6@gmail.com; Reddy, G. B., E-mail: rkrksharma6@gmail.com

In this report, we synthesize vertically aligned molybdenum trioxide (α−MoO{sub 3}) nanoflakes (NFs) with high aspect ratio (height/thickness >15) on the cobalt coated glass substrates by the plasma assisted sublimation process, employing Mo metal strip as a sublimation source. The effect of substrate temperature, nature of substrate as well as the geometry of the sublimation source (Mo-strip) have been investigated on the morphological, structural and optical properties of the grown NFs, keeping plasma parameters as fixed. The surface morphology, crystalline structure and optical properties of MoO{sub 3} NFs have been studied systematically by using scanning electron microscope (SEM), transmission electronmore » microscope (TEM) with selected area electron diffraction (SAED), X-ray diffractometer, and IR- spectroscopy. The experimental observations endorse that the characteristics of MoO{sub 3} NFs are strongly depend on substrate temperature, substrate nature as well as geometry of Mo-strip. All the observed results are well in consonance with each other.« less

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template.

PubMed

Sun, Zhiwei; Chen, Zhenbin; Zhang, Wenxu; Choi, Jaewon; Huang, Caili; Jeong, Gajin; Coughlin, E Bryan; Hsu, Yautzong; Yang, XiaoMin; Lee, Kim Y; Kuo, David S; Xiao, Shuaigang; Russell, Thomas P

2015-08-05

Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Technology for fabrication of a micromagnet on a tip of a MFM/MRFM probe

DOEpatents

Pelekhov, Denis V.; Hammel, P. Chris; Nunes, Jr., Geoffrey; Midzor, Melissa M.; Roukes, Michael

2004-01-13

A method for coating the tip of a mechanical resonator for use in magnetic force microscopy and magnetic resonance force microscopy in which the tip is coated with a ferromagnetic material and the cantilever is not, and the product resulting from the method. A cantilever and incorporated tip are coated with a photoresist, except that surface tension keeps photoresist off the tip. The cantilever and tip are then coated with a magnetic material. Next, acetone is used to lift off the magnetic material from the cantilever but not from the tip.

Fabrication of 3D gold/polymer conductive microstructures via direct laser writing (Conference Presentation)

NASA Astrophysics Data System (ADS)

Blasco, Eva; Müller, Jonathan B.; Müller, Patrick; Fischer, Andreas C.; Barner-Kowollik, Christopher; Wegener, Martin

2017-02-01

During the last years there has been significant interest in the fabrication of conductive three-dimensional (3D) structures on the micrometer scale due to their potential applications in microelectronics or emerging fields such as flexible electronics, nanophotonics, and plasmonics. Two-photon direct laser writing (DLW) has been proposed as a potential tool for the fabrication of 3D microstructures in various contexts. The majority of these two-photon processes involve the preparation of insoluble polymeric networks using photopolymerizable photoresins based on acrylate or epoxy groups. Nevertheless, the preparation of conductive 3D microstructures is still very challenging. The aim of the current work has been the preparation of conductive 3D microstructures via DLW by employing a newly developed photoresist. The photoresist consists of acrylate-functionalized poly(ethylene glycol) derivates and HAuCl4 as the gold precursor. By varying the gold content of the photoresist, different structures have been prepared and characterized by SEM and XPS. Conductivity of individual wires between prefabricated macroelectrodes has been measured too. Subsequently, the material has been employed to demonstrate the possibility of true 3D microscale connections.

Brightness field distributions of microlens arrays using micro molding.

PubMed

Cheng, Hsin-Chung; Huang, Chiung-Fang; Lin, Yi; Shen, Yung-Kang

2010-12-20

This study describes the brightness field distributions of microlens arrays fabricated by micro injection molding (μIM) and micro injection-compression molding (μICM). The process for fabricating microlens arrays used room-temperature imprint lithography, photoresist reflow, electroforming, μIM, μICM, and optical properties measurement. Analytical results indicate that the brightness field distribution of the molded microlens arrays generated by μICM is better than those made using μIM. Our results further demonstrate that mold temperature is the most important processing parameter for brightness field distribution of molded microlens arrays made by μIM or μICM.

Anisotropic Etching Using Reactive Cluster Beams

NASA Astrophysics Data System (ADS)

Koike, Kunihiko; Yoshino, Yu; Senoo, Takehiko; Seki, Toshio; Ninomiya, Satoshi; Aoki, Takaaki; Matsuo, Jiro

2010-12-01

The characteristics of Si etching using nonionic cluster beams with highly reactive chlorine-trifluoride (ClF3) gas were examined. An etching rate of 40 µm/min or higher was obtained even at room temperature when a ClF3 molecular cluster was formed and irradiated on a single-crystal Si substrate in high vacuum. The etching selectivity of Si with respect to a photoresist and SiO2 was at least 1:1000. We also succeeded in highly anisotropic etching with an aspect ratio of 10 or higher. Moreover, this etching method has a great advantage of low damage, compared with the conventional plasma process.

Process for the treatment of lignocellulosic biomass

DOEpatents

Dale, Bruce E.; Lynd, Lee R.; Laser, Mark

2013-03-12

A process for the treatment of biomass to render structural carbohydrates more accessible and/or digestible using concentrated ammonium hydroxide with or without anhydrous ammonia addition, is described. The process preferably uses steam to strip ammonia from the biomass for recycling. The process yields of monosaccharides from the structural carbohydrates are good, particularly as measured by the enzymatic hydrolysis of the structural carbohydrates. The monosaccharides are used as animal feeds and energy sources for ethanol production.

Research and Development Trend of Shape Control for Cold Rolling Strip

NASA Astrophysics Data System (ADS)

Wang, Dong-Cheng; Liu, Hong-Min; Liu, Jun

2017-09-01

Shape is an important quality index of cold rolling strip. Up to now, many problems in the shape control domain have not been solved satisfactorily, and a review on the research progress in the shape control domain can help to seek new breakthrough directions. In the past 10 years, researches and applications of shape control models, shape control means, shape detection technology, and shape control system have achieved significant progress. In the aspect of shape control models, the researches in the past improve the accuracy, speed and robustness of the models. The intelligentization of shape control models should be strengthened in the future. In the aspect of the shape control means, the researches in the past focus on the roll optimization, mill type selection, process optimization, local strip shape control, edge drop control, and so on. In the future, more attention should be paid to the coordination control of both strip shape and other quality indexes, and the refinement of control objective should be strengthened. In the aspects of shape detection technology and shape control system, some new types of shape detection meters and shape control systems are developed and have successfully industrial applications. In the future, the standardization of shape detection technology and shape control system should be promoted to solve the problem of compatibility. In general, the four expected development trends of shape control for cold rolling strip in the future are intelligentization, coordination, refinement, and standardization. The proposed research provides new breakthrough directions for improving shape quality.

Microactuator production via high aspect ratio, high edge acuity metal fabrication technology

NASA Technical Reports Server (NTRS)

Guckel, H.; Christenson, T. R.

1993-01-01

LIGA is a procession sequence which uses x-ray lithography on photoresist layers of several hundred micrometers to produce very high edge acuity photopolymer molds. These plastic molds can be converted to metal molds via electroplating of many different metals and alloys. The end results are high edge acuity metal parts with large structural heights. The LIGA process as originally described by W. Ehrfeld can be extended by adding a surface micromachining phase to produce precision metal parts which can be assembled to form three-dimensional micromechanisms. This process, SLIGA, has been used to fabricate a dynamometer on a chip. The instrument has been fully implemented and will be applied to tribology issues, speed-torque characterization of planar magnetic micromotors and a new family of sensors.

Fabrication of amorphous IGZO thin film transistor using self-aligned imprint lithography with a sacrificial layer

NASA Astrophysics Data System (ADS)

Kim, Sung Jin; Kim, Hyung Tae; Choi, Jong Hoon; Chung, Ho Kyoon; Cho, Sung Min

2018-04-01

An amorphous indium-gallium-zinc-oxide (a-IGZO) thin film transistor (TFT) was fabricated by a self-aligned imprint lithography (SAIL) method with a sacrificial photoresist layer. The SAIL is a top-down method to fabricate a TFT using a three-dimensional multilayer etch mask having all pattern information for the TFT. The sacrificial layer was applied in the SAIL process for the purpose of removing the resin residues that were inevitably left when the etch mask was thinned by plasma etching. This work demonstrated that the a-IGZO TFT could be fabricated by the SAIL process with the sacrificial layer. Specifically, the simple fabrication process utilized in this study can be utilized for the TFT with a plasma-sensitive semiconductor such as the a-IGZO and further extended for the roll-to-roll TFT fabrication.

Nitrogen-doped graphene quantum dots-based fluorescence molecularly imprinted sensor for thiacloprid detection.

PubMed

Liu, Yang; Cao, Nan; Gui, Wenying; Ma, Qiang

2018-06-01

In this paper, a test strip-based sensor was developed for thiacloprid quantitative detection based on PDA molecularly imprinted polymer (MIP) and nitrogen-doped graphene quantum dots (N-GQDs). Thiacloprid is a new type of nicotine insecticide, which can block the normal neurotransmitter delivery process in insects. In the sensing system, N-GQDs were immersed into filter paper at first. Then, dopamine (DA) with thiacloprid can be self-polymerized on test strip surface to form the uniform PDA film. After removed thiacloprid template, the established poly dopamine (PDA) MIP can selectively recognize thiacloprid. As a result, captured thiacloprid can enhance the fluorescence intensity of N-GQDs into the test strip. As a result, the fluorescence intensity of N-GQDs can be linearly related within a certain range of thiacloprid concentration. Under the optimum conditions, the proposed sensor for thiacloprid detection exhibited a linear ranging from 0.1 mg/L to 10 mg/L with a low detection limit of 0.03 mg/L. The N-GQDs based test strip-based sensor for thiaclopridis reported for the first time. The sensing system has high selectivity to thiacloprid and provides new opportunities in the pesticide detection. Copyright © 2018 Elsevier B.V. All rights reserved.

Bi cluster-assembled interconnects produced using SU8 templates

NASA Astrophysics Data System (ADS)

Partridge, J. G.; Matthewson, T.; Brown, S. A.

2007-04-01

Bi clusters with an average diameter of 25 nm have been deposited from an inert gas aggregation source and assembled into thin-film interconnects which are formed between planar electrical contacts and supported on Si substrates passivated with Si3N4 or thermally grown oxide. A layer of SU8 (a negative photoresist based on EPON SU-8 epoxy resin) is patterned using optical or electron-beam lithography, and it defines the position and dimensions of the cluster film. The conduction between the contacts is monitored throughout the deposition/assembly process, and subsequent I(V) characterization is performed in situ. Bi cluster-assembled interconnects have been fabricated with nanoscale widths and with up to 1:1 thickness:width aspect ratios. The conductivity of these interconnects has been increased, post-deposition, using a simple thermal annealing process.

Topography printing to locally control wettability.

PubMed

Zheng, Zijian; Azzaroni, Omar; Zhou, Feng; Huck, Wilhelm T S

2006-06-21

This paper reports a new patterning method, which utilizes NaOH to facilitate the irreversible binding between the PDMS stamp and substrates and subsequent cohesive mechanical failure to transfer the PDMS patterns. Our method shows high substrate tolerance and can be used to "print" various PDMS geometries on a wide range of surfaces, including Si100, glass, gold, polymers, and patterned SU8 photoresist. Using this technique, we are able to locally change the wettability of substrate surfaces by printing well-defined PDMS architectures on the patterned SU8 photoresist. It is possible to generate differential wetting and dewetting properties in microchannels and in the PDMS printed area, respectively.

Process for the treatment of lignocellulosic biomass

DOEpatents

Dale, Bruce E.

2014-07-08

A process for the treatment of biomass to render structural carbohydrates more accessible and/or digestible using concentrated ammonium hydroxide with or without anhydrous ammonia addition, is described. The process preferably uses steam to strip ammonia from the biomass for recycling. The process yields of monosaccharides from the structural carbohydrates are good, particularly as measured by the enzymatic hydrolysis of the structural carbohydrates. The monosaccharides are used as animal feeds and energy sources for ethanol production.

SU-8 negative photoresist for optical mask manufacturing

NASA Astrophysics Data System (ADS)

Bogdanov, Alexei L.

2000-06-01

The requirements for better control, linearity, and uniformity of critical dimension (CD) on photomasks in fabrication of 180 and 150 nm generation devices result in increasing demand for thinner, more etching durable, and more sensitive e-beam resists. Novolac based resists with chemical amplification have been a choice for their sensitivity and stability during etching. However, difficult CD control due to the acid catalyzer diffusion and quite narrow post exposure bake (PEB) process window are some of the major drawbacks of these resists. SU-8 is recently introduced to the market negative photoresist. High sensitivity, fairly good adhesion properties, and relatively simple processing of SU-8 make it a good substitution for novolac based chemically amplified negative e-beam resists in optical mask manufacturing. The replacement of traditional chemically amplified resists by SU- 8 can increase the process latitude and reduce resist costs. Among the obvious drawbacks of SU-8 are the use of solvent- based developer and demand of oxygen plasma for resist removal. In this paper the use of SU-8 for optical mask manufacturing is reported. All steps of resist film preparation, exposure and development are paid a share of attention. Possibilities to use reactive ion etching (RIE) with oxygen in order to increase resist mask contrast are discussed. Special exposure strategy (pattern outlining) was employed to further improve the edge definition. The resist PEB temperature and time were studied to estimate their weight in overall CD control performance. Specially designed test patterns with 0.25 micrometer design rule could be firmly transferred into a chromium layer both by wet etching and ion milling. Influence of exposure dose variation on the pattern CD change was studied.

Next Generation Solvent Performance in the Modular Caustic Side Solvent Extraction Process - 15495

DOE Office of Scientific and Technical Information (OSTI.GOV)

Smith, Tara E.; Scherman, Carl; Martin, David

Changes to the Modular Caustic Side Solvent Extraction Unit (MCU) flow-sheet were implemented in the facility. Implementation included changing the scrub and strip chemicals and concentrations, modifying the O/A ratios for the strip, scrub, and extraction contactor banks, and blending the current BoBCalixC6 extractant-based solvent in MCU with clean MaxCalix extractant-based solvent. During the successful demonstration period, the MCU process was subject to rigorous oversight to ensure hydraulic stability and chemical/radionuclide analysis of the key process tanks (caustic wash tank, solvent hold tank, strip effluent hold tank, and decontaminated salt solution hold tank) to evaluate solvent carryover to downstream facilitiesmore » and the effectiveness of cesium removal from the liquid salt waste. Results indicated the extraction of cesium was significantly more effective with an average Decontamination Factor (DF) of 1,129 (range was 107 to 1,824) and that stripping was effective. The contactor hydraulic performance was stable and satisfactory, as indicated by contactor vibration, contactor rotational speed, and flow stability; all of which remained at or near target values. Furthermore, the Solvent Hold Tank (SHT) level and specific gravity was as expected, indicating that solvent integrity and organic hydraulic stability were maintained. The coalescer performances were in the range of processing results under the BOBCalixC6 flow sheet, indicating negligible adverse impact of NGS deployment. After the Demonstration period, MCU began processing via routine operations. Results to date reiterate the enhanced cesium extraction and stripping capability of the Next Generation Solvent (NGS) flow sheet. This paper presents process performance results of the NGS Demonstration and continued operations of MCU utilizing the blended BobCalixC6-MaxCalix solvent under the NGS flowsheet.« less

Micromachined microwave signal control device and method for making same

DOEpatents

Forman, Michael A [San Francisco, CA

2008-09-02

A method for fabricating a signal controller, e.g., a filter or a switch, for a coplanar waveguide during the LIGA fabrication process of the waveguide. Both patterns for the waveguide and patterns for the signal controllers are created on a mask. Radiation travels through the mask and reaches a photoresist layer on a substrate. The irradiated portions are removed and channels are formed on the substrate. A metal is filled into the channels to form the conductors of the waveguide and the signal controllers. Micromachined quasi-lumped elements are used alone or together as filters. The switch includes a comb drive, a spring, a metal plunger, and anchors.

Large-core single-mode rib SU8 waveguide using solvent-assisted microcontact molding.

PubMed

Huang, Cheng-Sheng; Wang, Wei-Chih

2008-09-01

This paper describes a novel fabrication technique for constructing a polymer-based large-core single-mode rib waveguide. A negative tone SU8 photoresist with a high optical transmission over a large wavelength range and stable mechanical properties was used as a waveguide material. A waveguide was constructed by using a polydimethylsiloxane stamp combined with a solvent-assisted microcontact molding technique. The effects on the final pattern's geometry of four different process conditions were investigated. Optical simulations were performed using beam propagation method software. Single-mode beam propagation was observed at the output of the simulated waveguide as well as the actual waveguide through the microscope image.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Smith, D.J.; Warner, J.A.; LeBarron, N.

Processes that use energetic ions for large substrates require that the time-averaged erosion effects from the ion flux be uniform across the surface. A numerical model has been developed to determine this flux and its effects on surface etching of a silica/photoresist combination. The geometry of the source and substrate is very similar to a typical deposition geometry with single or planetary substrate rotation. The model was used to tune an inert ion-etching process that used single or multiple Kaufman sources to less than 3% uniformity over a 30-cm aperture after etching 8 {micro}m of material. The same model canmore » be used to predict uniformity for ion-assisted deposition (IAD).« less

Characterization of a New Organosilicon Photoresist

NASA Astrophysics Data System (ADS)

Cunningham, Wells C.

1987-08-01

For a number of years, there has lo'ep. great interest in organometallic based photoresists for use as the top layer in multilevel resist schemes.-' In general, bilevel approaches to lithography are forced upon the industry as a means of planarizing topography for a subsequent patterning step. This pattern is initially defined by exposure and development of a thin top layer (0.3 to 0.5μm) over the thicker bottom layer (1.0 to 2.0μm). (See Figure 1). In a conventional bilevel approach, the chosen bottom layer is photoactive at a wavelength for which the top is relatively opaque. The top level acts as a portable conformable mask (PCM) for image transfer through the bottom layer after its exposure and wet development. By using a silicon containing photoresist on the top image transfer may be accomplished using an oxygen plasma instead of a second exposure and development. The PCM in this case acts as an etch mask by forming a silicon dioxide crust in the plasma which slows the etch rate of the top versus the bottom layer. A generic curve of etch rate of a photoresist versus percent silicon by weight is shown in Figure 2. The shape is similar over a wide range of organosilicon polymers.5,6

Centimeter-scale subwavelength photolithography using metal-coated elastomeric photomasks with modulated light intensity at the oblique sidewalls.

PubMed

Wu, Jin; Liu, Yayuan; Guo, Yuanyuan; Feng, Shuanglong; Zou, Binghua; Mao, Hui; Yu, Cheng-han; Tian, Danbi; Huang, Wei; Huo, Fengwei

2015-05-05

By coating polydimethylsiloxane (PDMS) relief structures with a layer of opaque metal such as gold, the incident light is strictly allowed to pass through the nanoscopic apertures at the sidewalls of PDMS reliefs to expose underlying photoresist at nanoscale regions, thus producing subwavelength nanopatterns covering centimeter-scale areas. It was found that the sidewalls were a little oblique, which was the key to form the nanoscale apertures. Two-sided and one-sided subwavelength apertures can be constructed by employing vertical and oblique metal evaporation directions, respectively. Consequently, two-line and one-line subwavelength nanopatterns with programmable feature shapes, sizes, and periodicities could be produced using the obtained photomasks. The smallest aperture size and line width of 80 nm were achieved. In contrast to the generation of raised positive photoresist nanopatterns in phase shifting photolithography, the recessed positive photoresist nanopatterns produced in this study provide a convenient route to transfer the resist nanopatterns to metal nanopatterns. This nanolithography methodology possesses the distinctive advantages of simplicity, low cost, high throughput, and nanoscale feature size and shape controllability, making it a potent nanofabrication technique to enable functional nanostructures for various potential applications.

Mechanically metastable structures generated by single pulse laser-induced periodic surface structures (LIPSS) in the photoresist SU8.

PubMed

Reinhardt, Hendrik; Peschke, Patrick; Riedel, René; Hampp, Norbert

2018-07-27

Laser-induced periodic surface structures (LIPSS) with a periodicity of 351 nm are generated in the negative photoresist SU8 by single nanosecond laser pulse impact. Friction scans indicate the periodic pattern to comprise alternating regions of crosslinked and non-crosslinked SU8. Intriguingly, even minor mechanical stimuli in the order of nanonewtons cause the unfolding or rather the deletion of the characteristic periodic pattern similarly to the release of a pre-loaded spring. This feature combined with high resilience to heat and photon irradiation makes SU8-LIPSS attractive for applications such as mechanical stress monitors, self-destructing memory and passive micro actuators.

Development of a direct patterning method for functional oxide thin films using ultraviolet irradiation and hybrid-cluster gels and its application to thin-film transistor fabrication

NASA Astrophysics Data System (ADS)

Yoshimoto, Yuuki; Li, Jinwang; Shimoda, Tatsuya

2018-04-01

A gel state exists in the solution-solid conversion process. We found that solidification can be promoted by irradiating the gel with ultraviolet (UV) light. In this study, a patterning method without using a vacuum system or employing photoresist materials has been proposed wherein solidification was applied to a gel by UV irradiation. Indium oxide gel, indium gallium oxide gel, lanthanum zirconium oxide gel, and lanthanum ruthenium oxide gels were successfully patterned by using our technique. Moreover, an oxide thin-film transistor was fabricated by our novel patterning method and was successfully operated.

Method for making a micromachined microwave signal control device

DOEpatents

Forman, Michael A [Mountain House, CA

2011-02-15

A method for fabricating a signal controller, e.g., a filter or a switch, for a coplanar waveguide during the LIGA fabrication process of the waveguide. Both patterns for the waveguide and patterns for the signal controllers are created on a mask. Radiation travels through the mask and reaches a photoresist layer on a substrate. The irradiated portions are removed and channels are formed on the substrate. A metal is filled into the channels to form the conductors of the waveguide and the signal controllers. Micromachined quasi-lumped elements are used alone or together as filters. The switch includes a comb drive, a spring, a metal plunger, and anchors.

Method for the recovery of actinide elements from nuclear reactor waste

DOEpatents

Horwitz, E. Philip; Delphin, Walter H.; Mason, George W.

1979-01-01

A process for partitioning and recovering actinide values from acidic waste solutions resulting from reprocessing of irradiated nuclear fuels by adding hydroxylammonium nitrate and hydrazine to the waste solution to adjust the valence of the neptunium and plutonium values in the solution to the +4 oxidation state, thus forming a feed solution and contacting the feed solution with an extractant of dihexoxyethyl phosphoric acid in an organic diluent whereby the actinide values, most of the rare earth values and some fission product values are taken up by the extractant. Separation is achieved by contacting the loaded extractant with two aqueous strip solutions, a nitric acid solution to selectively strip the americium, curium and rare earth values and an oxalate solution of tetramethylammonium hydrogen oxalate and oxalic acid or trimethylammonium hydrogen oxalate to selectively strip the neptunium, plutonium and fission product values. Uranium values remain in the extractant and may be recovered with a phosphoric acid strip. The neptunium and plutonium values are recovered from the oxalate by adding sufficient nitric acid to destroy the complexing ability of the oxalate, forming a second feed, and contacting the second feed with a second extractant of tricaprylmethylammonium nitrate in an inert diluent whereby the neptunium and plutonium values are selectively extracted. The values are recovered from the extractant with formic acid.

Aptamer-Nanoparticle Strip Biosensor for Rapid and Sensitive Detection of Cancer Cells

PubMed Central

Mao, Xun; Phillips, Joseph A.; Xu, Hui; Tan, Weihong; Zeng, Lingwen; Liu, Guodong

2009-01-01

We report an aptamer-nanoparticle strip biosensor (ANSB) for the rapid, specific, sensitive and low-cost detection of circulating cancer cells. Known for their high specificity and affinity, aptamers were first selected from live cells by the cell-SELEX (systematic evolution of ligands by exponential enrichment) process. When next combined with the unique optical properties of gold nanoparticles (Au-NPs), ANSBs were prepared on a lateral flow device. Ramos cells were used as a model target cell to demonstrate proof of principle. Under optimal conditions, the ANSB was capable of detecting a minimum of 4000 Ramos cells without instrumentation (visual judgment) and 800 Ramos cells with a portable strip reader within 15 minutes. Importantly, ANSB has successfully detected Ramos cells in human blood, thus providing a rapid, sensitive and low-cost quantitative tool for the detection of circulating cancer cells. ANSB therefore shows great promise for in-field and point-of-care cancer diagnosis and therapy. PMID:19904989

Fabrication of high quality aspheric microlens array by dose-modulated lithography and surface thermal reflow

NASA Astrophysics Data System (ADS)

Huang, Shengzhou; Li, Mujun; Shen, Lianguan; Qiu, Jinfeng; Zhou, Youquan

2018-03-01

A novel fabrication method for high quality aspheric microlens array (MLA) was developed by combining the dose-modulated DMD-based lithography and surface thermal reflow process. In this method, the complex shape of aspheric microlens is pre-modeled via dose modulation in a digital micromirror device (DMD) based maskless projection lithography. And the dose modulation mainly depends on the distribution of exposure dose of photoresist. Then the pre-shaped aspheric microlens is polished by a following non-contact thermal reflow (NCTR) process. Different from the normal process, the reflow process here is investigated to improve the surface quality while keeping the pre-modeled shape unchanged, and thus will avoid the difficulties in generating the aspheric surface during reflow. Fabrication of a designed aspheric MLA with this method was demonstrated in experiments. Results showed that the obtained aspheric MLA was good in both shape accuracy and surface quality. The presented method may be a promising approach in rapidly fabricating high quality aspheric microlens with complex surface.

Fabrication of nanostructured transmissive optical devices on ITO-glass with UV1116 photoresist using high-energy electron beam lithography

NASA Astrophysics Data System (ADS)

Williams, Calum; Bartholomew, Richard; Rughoobur, Girish; Gordon, George S. D.; Flewitt, Andrew J.; Wilkinson, Timothy D.

2016-12-01

High-energy electron beam lithography for patterning nanostructures on insulating substrates can be challenging. For high resolution, conventional resists require large exposure doses and for reasonable throughput, using typical beam currents leads to charge dissipation problems. Here, we use UV1116 photoresist (Dow Chemical Company), designed for photolithographic technologies, with a relatively low area dose at a standard operating current (80 kV, 40-50 μC cm-2, 1 nAs-1) to pattern over large areas on commercially coated ITO-glass cover slips. The minimum linewidth fabricated was ˜33 nm with 80 nm spacing; for isolated structures, ˜45 nm structural width with 50 nm separation. Due to the low beam dose, and nA current, throughput is high. This work highlights the use of UV1116 photoresist as an alternative to conventional e-beam resists on insulating substrates. To evaluate suitability, we fabricate a range of transmissive optical devices, that could find application for customized wire-grid polarisers and spectral filters for imaging, which operate based on the excitation of surface plasmon polaritons in nanosized geometries, with arrays encompassing areas ˜0.25 cm2.

Scannable Millimeter Wave Arrays. Volume 1

DTIC Science & Technology

1989-04-01

confusions all became clarified. In the process , much was learned of a basic nature, and the behavior of the microstrip leaky-wave strip antennas became... process , we can compute the complete propagation behavior for the structure in Fig. 3,10. We are interested in particular in the variation of 01ko...from conical scan. To understand the reason for the effect, let us reexamine the scan process . We first consider the limiting case for which k op = 0

Mechanically metastable structures generated by single pulse laser-induced periodic surface structures (LIPSS) in the photoresist SU8

NASA Astrophysics Data System (ADS)

Reinhardt, Hendrik; Peschke, Patrick; Riedel, René; Hampp, Norbert

2018-07-01

Laser-induced periodic surface structures (LIPSS) with a periodicity of 351 nm are generated in the negative photoresist SU8 by single nanosecond laser pulse impact. Friction scans indicate the periodic pattern to comprise alternating regions of crosslinked and non-crosslinked SU8. Intriguingly, even minor mechanical stimuli in the order of nanonewtons cause the unfolding or rather the deletion of the characteristic periodic pattern similarly to the release of a pre-loaded spring. This feature combined with high resilience to heat and photon irradiation makes SU8-LIPSS attractive for applications such as mechanical stress monitors, self-destructing memory and passive micro actuators.

Patterned forests of vertically-aligned multiwalled carbon nanotubes using metal salt catalyst solutions.

PubMed

Garrett, David J; Flavel, Benjamin S; Baronian, Keith H R; Downard, Alison J

2013-01-01

A simple method for producing patterned forests of multiwalled carbon nanotubes (MWCNTs) is described. An aqueous metal salt solution is spin-coated onto a substrate patterned with photoresist by standard methods. The photoresist is removed by acetone washing leaving the acetone-insoluble catalyst pattern on the substrate. Dense forests of vertically aligned (VA) MWCNTs are grown on the patterned catalyst layers by chemical vapour deposition. The procedures have been demonstrated by growing MWCNT forests on two substrates: silicon and conducting graphitic carbon films. The forests adhere strongly to the substrates and when grown directly on carbon film, offer a simple method of preparing MWCNT electrodes.

Photoresist Design for Elastomeric Light Tunable Photonic Devices

PubMed Central

Nocentini, Sara; Martella, Daniele; Parmeggiani, Camilla; Wiersma, Diederik S.

2016-01-01

An increasing interest in tunable photonic structures is growing within the photonic community. The usage of Liquid Crystalline Elastomer (LCE) structures in the micro-scale has been motivated by the potential to remotely control their properties. In order to design elastic photonic structures with a three-dimensional lithographic technique, an analysis of the different mixtures used in the micro-printing process is required. Previously reported LCE microstructures suffer damage and strong swelling as a limiting factor of resolution. In this article, we reported a detailed study on the writing process with four liquid crystalline photoresists, in which the percentage of crosslinker is gradually increased. The experiments reveal that exploiting the crosslinking degree is a possible means in which to obtain suspended lines with good resolution, quite good rigidity, and good elasticity, thereby preserving the possibility of deformation by light irradiation. PMID:28773646

Approximate strip exchanging.

PubMed

Roy, Swapnoneel; Thakur, Ashok Kumar

2008-01-01

Genome rearrangements have been modelled by a variety of primitives such as reversals, transpositions, block moves and block interchanges. We consider such a genome rearrangement primitive Strip Exchanges. Given a permutation, the challenge is to sort it by using minimum number of strip exchanges. A strip exchanging move interchanges the positions of two chosen strips so that they merge with other strips. The strip exchange problem is to sort a permutation using minimum number of strip exchanges. We present here the first non-trivial 2-approximation algorithm to this problem. We also observe that sorting by strip-exchanges is fixed-parameter-tractable. Lastly we discuss the application of strip exchanges in a different area Optical Character Recognition (OCR) with an example.

Spectroscopic studies of yellow supergiants in the Cepheid instability strip

NASA Astrophysics Data System (ADS)

Usenko, I. A.

2017-04-01

High-resolution spectra of nine yellow nonvariable supergiants (NVSs) located within the canonical Cepheid instability strip from Sandage and Tammann (1969) ( α Aqr, ɛ Leo, μ Per, ω Gem, BD+60 2532, HD 172365, HD 187299, HD 190113, and HD 200102) were taken with the 1-m Zeiss and 6-m BTA telescopes at the Special Astrophysical Observatory of the Russian Academy of Sciences in the 1990s. These have been used to determine the atmospheric parameters, chemical composition, radial velocities, reddenings, luminosities, distances, and radii. The spectroscopic estimates of T eff and the luminosities determined from the Hipparcos parallaxes have shown eight of the nine program NVSs on the T eff-log( L/ L ⊙) diagram to be outside the canonical Cepheid instability strip. When the edges of the Cepheid instability strip from Bono et al. (2000) are used, out of the NVSs from the list on the diagram one is within the Cepheid instability strip but closer to the red edge, two are at the red edge, three are beyond the red edge, two are at the blue edge, and one is beyond the blue edge. The evolutionary masses of the objects have been estimated. The abundances of α-elements, r- and s-process elements for all program objects have turned out to be nearly solar. The CNO, Na, Mg, and Al abundance estimates have shown that eight of the nine NVSs from the list have already passed the first dredge-up. Judging by the abundances of the key elements and its position on the T eff-log( L/ L ⊙) diagram, the lithium-rich supergiant HD 172365 is at the post-main-sequence evolutionary stage of gravitational helium core contraction and moves toward the first crossing of the Cepheid instability strip. The star ɛ Leo should be assigned to bright supergiants, while HD 187299 and HD 190113 may have already passed the second dredge-up and move to the asymptotic branch.

Crack propagation in functionally graded strip under thermal shock

NASA Astrophysics Data System (ADS)

Ivanov, I. V.; Sadowski, T.; Pietras, D.

2013-09-01

The thermal shock problem in a strip made of functionally graded composite with an interpenetrating network micro-structure of Al2O3 and Al is analysed numerically. The material considered here could be used in brake disks or cylinder liners. In both applications it is subjected to thermal shock. The description of the position-dependent properties of the considered functionally graded material are based on experimental data. Continuous functions were constructed for the Young's modulus, thermal expansion coefficient, thermal conductivity and thermal diffusivity and implemented as user-defined material properties in user-defined subroutines of the commercial finite element software ABAQUS™. The thermal stress and the residual stress of the manufacturing process distributions inside the strip are considered. The solution of the transient heat conduction problem for thermal shock is used for crack propagation simulation using the XFEM method. The crack length developed during the thermal shock is the criterion for crack resistance of the different graduation profiles as a step towards optimization of the composition gradient with respect to thermal shock sensitivity.

STS-55 Earth observation of agricultural development in northern Argentina

NASA Technical Reports Server (NTRS)

1993-01-01

STS-55 Earth observation taken aboard Columbia, Orbiter Vehicle (OV) 102, is of agricultural development in northern Argentina. This photograph is from a mapping strip of photographs acquired by the STS-55 crew. This mapping strip runs from the 'eyelash forests' of the Bolivian Andes, southeast across the Chaco Plains, and into the upper Parana River Basin of north-central Argentina. The formerly densely forested areas between the upper Rio Pilcomayo and the Rio Teuco of NW Argentina rest on deep, rich alluvial and loess deposits. These modern soils were carried into the region by rivers from the Andes and by dust storms from large playa areas of the Altiplano (high plains) of Peru and Boliva. In this scene, representative of the long mapping strip, the process of converting forests to agriculture is far advanced. The original road network, a series of grids laid out in the forest, has nearly coalesced into a farm and ranch landscape. Some few relict forests are still visible as distin

Fabrication of nanostructured transmissive optical devices on ITO-glass with UV1116 photoresist using high-energy electron beam lithography.

PubMed

Williams, Calum; Bartholomew, Richard; Rughoobur, Girish; Gordon, George S D; Flewitt, Andrew J; Wilkinson, Timothy D

2016-12-02

High-energy electron beam lithography for patterning nanostructures on insulating substrates can be challenging. For high resolution, conventional resists require large exposure doses and for reasonable throughput, using typical beam currents leads to charge dissipation problems. Here, we use UV1116 photoresist (Dow Chemical Company), designed for photolithographic technologies, with a relatively low area dose at a standard operating current (80 kV, 40-50 μC cm -2 , 1 nAs -1 ) to pattern over large areas on commercially coated ITO-glass cover slips. The minimum linewidth fabricated was ∼33 nm with 80 nm spacing; for isolated structures, ∼45 nm structural width with 50 nm separation. Due to the low beam dose, and nA current, throughput is high. This work highlights the use of UV1116 photoresist as an alternative to conventional e-beam resists on insulating substrates. To evaluate suitability, we fabricate a range of transmissive optical devices, that could find application for customized wire-grid polarisers and spectral filters for imaging, which operate based on the excitation of surface plasmon polaritons in nanosized geometries, with arrays encompassing areas ∼0.25 cm 2 .

Thermal degradation of the solvent employed in the next-generation caustic-side solvent extraction process and its effect on the extraction, scrubbing, and stripping of cesium

DOE PAGES

Roach, Benjamin D.; Williams, Neil J.; Moyer, Bruce A.

2015-09-02

As part of the ongoing development of the Next-Generation Caustic-Side Solvent Extraction (NGS) process, the thermal stability of the process solvent was investigated and shown to be adequate for industrial application. The solvent was thermally treated at 35 C over a period of 13 months whilst in dynamic contact with each of the aqueous phases of the current NGS process, namely SRS 15 (a highly caustic waste simulant), sodium hydroxide scrub solution (0.025 M), and boric acid strip solution (0.01 M). The effect of thermal treatment was evaluated by assessing batch extract/scrub/strip performance as a function of time, by monitoringmore » the sodium extraction capacity of the solvent, and by analysis of the solvent using electrospray mass spectrometry. Current studies indicate that the NGS solvent should be thermally robust for a period of XXX months at the Modular Caustic-Side Solvent Extraction Unit (MCU) pilot plant located at Savannah River Site. Furthermore, the guanidine suppressor appears to be the solvent component most significantly impacted by thermal treatment of the solvent, showing significant degradation over time.« less

Invisible Security Printing on Photoresist Polymer Readable by Terahertz Spectroscopy.

PubMed

Shin, Hee Jun; Lim, Min-Cheol; Park, Kisang; Kim, Sae-Hyung; Choi, Sung-Wook; Ok, Gyeongsik

2017-12-06

We experimentally modulate the refractive index and the absorption coefficient of an SU-8 dry film in the terahertz region by UV light (362 nm) exposure with time dependency. Consequently, the refractive index of SU-8 film is increased by approximately 6% after UV light exposure. Moreover, the absorption coefficient also changes significantly. Using the reflective terahertz imaging technique, in addition, we can read security information printed by UV treatment on an SU-8 film that is transparent in the visible spectrum. From these results, we successfully demonstrate security printing and reading by using photoresist materials and the terahertz technique. This investigation would provide a new insight into anti-counterfeiting applications in fields that need security.

Mathematical Modeling of the Effect of Roll Diameter on the Thermo-Mechanical Behavior of Twin Roll Cast AZ31 Magnesium Alloy Strips

NASA Astrophysics Data System (ADS)

Hadadzadeh, Amir; Wells, Mary

Although the Twin Roll Casting (TRC) process has been used in the aluminum sheet production industry for more than 60 years, the usage of this process to fabricate magnesium sheets is still at its early stages. Similar to other manufacturing processes, the development of the TRC process for magnesium alloys has followed a typical route of preliminary studies using a laboratory-scale facility, followed by pilot-scale testing and most recently attempting to use an industrial-scale twin roll caster. A powerful tool to understand and quantify the trends of the processing conditions and effects of scaling up from a laboratory size TRC machine to an industrial scale one is develop a mathematical model of the process. This can elucidate the coupled fluid-thermo-mechanical behavior of the cast strip during the solidification and then deformation stages of the process. In the present study a Thermal-Fluid-Stress model has been developed for TRC of AZ31 magnesium alloy for three roll diameters by employing the FEM commercial package ALSIM. The roll diameters were chosen as 355mm, 600mm and 1150mm. The effect of casting speed for each diameter was studied in terms of fluid flow, thermal history and stress-strain evolution in the cast strip in the roll bite region.

Successful photoresist removal: incorporating chemistry, conditions, and equipment

NASA Astrophysics Data System (ADS)

Moore, John C.

2002-07-01

The material make-up of photoresists span a wide polarity range and chemistry. Resists contain reactive components which are photochemically triggered to convert and condense to forms that result in a solubility change. When designing a cleaning process, a knowledge of the resist chemistry is fundamental. A DNQ/novolak system may follow a simple dissolution model under normal conditions. However, when the same resist is sent through a dry etch process, crosslinking and metallic impregnation occurs to form a residue that is insoluble by simple dissolution. The same applies for negative-tone resists, where bonds must be broken and a high chemical interaction is needed to facilitate solvent penetration. Negative resists of different chemistry, such as the benzoin/acrylic, trazine/novolak, and azide/isoprene, must be addressed separately for specific polarity and reactant requirements. When dissolving and removing these crosslinked systems, benefits in formulated chemistries such as GenSolveTM and GenCleanTM are immediately observed. Once the chemistry is identified, conditions can be optimized with process design using temperature, agitation, and rinsing to achieve a robust process with a wide process latitude.

Analytic description of the frictionally engaged in-plane bending process incremental swivel bending (ISB)

NASA Astrophysics Data System (ADS)

Frohn, Peter; Engel, Bernd; Groth, Sebastian

2018-05-01

Kinematic forming processes shape geometries by the process parameters to achieve a more universal process utilizations regarding geometric configurations. The kinematic forming process Incremental Swivel Bending (ISB) bends sheet metal strips or profiles in plane. The sequence for bending an arc increment is composed of the steps clamping, bending, force release and feed. The bending moment is frictionally engaged by two clamping units in a laterally adjustable bending pivot. A minimum clamping force hindering the material from slipping through the clamping units is a crucial criterion to achieve a well-defined incremental arc. Therefore, an analytic description of a singular bent increment is developed in this paper. The bending moment is calculated by the uniaxial stress distribution over the profiles' width depending on the bending pivot's position. By a Coulomb' based friction model, necessary clamping force is described in dependence of friction, offset, dimensions of the clamping tools and strip thickness as well as material parameters. Boundaries for the uniaxial stress calculation are given in dependence of friction, tools' dimensions and strip thickness. The results indicate that changing the bending pivot to an eccentric position significantly affects the process' bending moment and, hence, clamping force, which is given in dependence of yield stress and hardening exponent. FE simulations validate the model with satisfactory accordance.

Photoresist Design for Elastomeric Light Tunable Photonic Devices.

PubMed

Nocentini, Sara; Martella, Daniele; Parmeggiani, Camilla; Wiersma, Diederik S

2016-06-29

An increasing interest in tunable photonic structures is growing within the photonic community. The usage of Liquid Crystalline Elastomer (LCE) structures in the micro-scale has been motivated by the potential to remotely control their properties. In order to design elastic photonic structures with a three-dimensional lithographic technique, an analysis of the different mixtures used in the micro-printing process is required. Previously reported LCE microstructures suffer damage and strong swelling as a limiting factor of resolution. In this article, we reported a detailed study on the writing process with four liquid crystalline photoresists, in which the percentage of crosslinker is gradually increased. The experiments reveal that exploiting the crosslinking degree is a possible means in which to obtain suspended lines with good resolution, quite good rigidity, and good elasticity, thereby preserving the possibility of deformation by light irradiation.

40 CFR 63.1156 - Definitions.

Code of Federal Regulations, 2011 CFR

2011-07-01

... Standards for Hazardous Air Pollutants for Steel Pickling-HCl Process Facilities and Hydrochloric Acid... to remove residual acid. Carbon steel means steel that contains approximately 2 percent or less... equipment and tanks configured for pickling metal strip, rod, wire, tube, or pipe that is passed through an...

40 CFR 63.1156 - Definitions.

Code of Federal Regulations, 2010 CFR

2010-07-01

... Standards for Hazardous Air Pollutants for Steel Pickling-HCl Process Facilities and Hydrochloric Acid... to remove residual acid. Carbon steel means steel that contains approximately 2 percent or less... equipment and tanks configured for pickling metal strip, rod, wire, tube, or pipe that is passed through an...

Thermal degradation of the solvent employed in the next-generation caustic-side solvent extraction process and its effect on the extraction, scrubbing, and stripping of cesium

DOE Office of Scientific and Technical Information (OSTI.GOV)

Roach, Benjamin D.; Williams, Neil J.; Moyer, Bruce A.

As part of the ongoing development of the Next-Generation Caustic-Side Solvent Extraction (NGS) process, the thermal stability of the process solvent was investigated and shown to be adequate for industrial application. The solvent was thermally treated at 35 C over a period of 13 months whilst in dynamic contact with each of the aqueous phases of the current NGS process, namely SRS 15 (a highly caustic waste simulant), sodium hydroxide scrub solution (0.025 M), and boric acid strip solution (0.01 M). The effect of thermal treatment was evaluated by assessing batch extract/scrub/strip performance as a function of time, by monitoringmore » the sodium extraction capacity of the solvent, and by analysis of the solvent using electrospray mass spectrometry. Current studies indicate that the NGS solvent should be thermally robust for a period of XXX months at the Modular Caustic-Side Solvent Extraction Unit (MCU) pilot plant located at Savannah River Site. Furthermore, the guanidine suppressor appears to be the solvent component most significantly impacted by thermal treatment of the solvent, showing significant degradation over time.« less

Unsteady boundary-layer injection

NASA Technical Reports Server (NTRS)

Telionis, D. P.; Jones, G. S.

1981-01-01

The boundary-layer equations for two-dimensional incompressible flow are integrated numerically for the flow over a flat plate and a Howarth body. Injection is introduced either impulsively or periodically along a narrow strip. Results indicate that injection perpendicular to the wall is transmitted instantly across the boundary layer and has little effect on the velocity profile parallel to the wall. The effect is a little more noticeable for flows with adverse pressure gradients. Injection parallel to the wall results in fuller velocity profiles. Parallel and oscillatory injection appears to influence the mean. The amplitude of oscillation decreases with distance from the injection strip but further downstream it increases again in a manner reminiscent of an unstable process.

Straightening of a wavy strip: An elastic-plastic contact problem including snap-through

NASA Technical Reports Server (NTRS)

Fischer, D. F.; Rammerstorfer, F. G.

1980-01-01

The nonlinear behavior of a wave like deformed metal strip during the levelling process were calculated. Elastic-plastic material behavior as well as nonlinearities due to large deformations were considered. The considered problem lead to a combined stability and contact problem. It is shown that, despite the initially concentrated loading, neglecting the change of loading conditions due to altered contact domains may lead to a significant error in the evaluation of the nonlinear behavior and particularly to an underestimation of the stability limit load. The stability was examined by considering the load deflection path and the behavior of a load-dependent current stiffness parameter in combination with the determinant of the current stiffness matrix.

Discriminating satellite IR anomalies associated with the MS 7.1 Yushu earthquake in China

NASA Astrophysics Data System (ADS)

Qin, Kai; Wu, Lixin; Zheng, Shuo; Ma, Weiyu

2018-03-01

In the process of exploring pre-earthquake thermal anomalies using satellite infrared data, Blackett et al. (2011) found that the previously reported anomalies before the 2001 Mw 7.7 Gujarat earthquake, in India, were related to positive biases caused by data gaps due to cloud cover and mosaicing of neighboring orbits of MODIS satellite data. They supposed that such effects could also be responsible for other cases. We noted a strip-shaped TIR anomaly on March 17th, 2010, 28 days before the Ms. 7.1 Yushu earthquake (Qin et al., 2011). Here we again investigate multi-year infrared satellite data in different bands to discriminate whether the anomaly is associated with the earthquake, or is only bias caused by the data gaps. From the water vapor images, we find lots of clouds that have TIR anomalies. However, on the cloudiness background, there is an obvious strip-shaped gap matching the tectonic faults almost perfectly. In particular, the animation loops of hourly water vapor images show that the cloud kept moving from west to east, while they never covered the strip-shaped gap. We consider that the cloud with this special spatial pattern should have implied the abnormal signals associated with the seismogenic process. Based on current physical models, the satellite IR anomalies both on TIR and water vapor bands can qualitatively be explained using synthetic mechanisms.

Lateral flow strip assay

DOEpatents

Miles, Robin R [Danville, CA; Benett, William J [Livermore, CA; Coleman, Matthew A [Oakland, CA; Pearson, Francesca S [Livermore, CA; Nasarabadi, Shanavaz L [Livermore, CA

2011-03-08

A lateral flow strip assay apparatus comprising a housing; a lateral flow strip in the housing, the lateral flow strip having a receiving portion; a sample collection unit; and a reagent reservoir. Saliva and/or buccal cells are collected from an individual using the sample collection unit. The sample collection unit is immersed in the reagent reservoir. The tip of the lateral flow strip is immersed in the reservoir and the reagent/sample mixture wicks up into the lateral flow strip to perform the assay.

21 CFR 882.5900 - Preformed craniosynostosis strip.

Code of Federal Regulations, 2014 CFR

2014-04-01

... craniosynostosis strip. (a) Identification. A preformed craniosynostosis strip is a plastic strip used to cover bone edges of craniectomy sites (sites where the skull has been cut) to prevent the bone from regrowing...

Sources of salinity and boron in the Gaza strip: Natural contaminant flow in the southern Mediterranean coastal aquifer

NASA Astrophysics Data System (ADS)

Vengosh, Avner; Kloppmann, Wolfram; Marei, Amer; Livshitz, Yakov; Gutierrez, Alexis; Banna, Mazen; Guerrot, Catherine; Pankratov, Irena; Raanan, Hadas

2005-01-01

Salinization in coastal aquifers is a global phenomenon resulting from the overexploitation of scarce water resources. The Gaza Strip is one of the most severe cases of salinization, as accelerated degradation of the water quality endangers the present and future water supply for over 1 million people. We investigate the chemical and isotopic (87Sr/86Sr, δ11B, δ18O, δ2H, and δ34SSO4) compositions of groundwater from the southern Mediterranean coastal aquifer (Israel) and the Gaza Strip in order to elucidate the origin of salinity and boron contamination. The original salinity in the eastern part of the aquifer is derived from discharge of saline groundwater from the adjacent Avedat aquitard (Na/Cl < 1, 87Sr/86Sr ˜ 0.7079, and δ11B ˜ 40‰). As the groundwater flows to the central part of the aquifer, a dramatic change in its composition occurs (Na/Cl > 1, high B/Cl, SO4/Cl, and HCO3, 87Sr/86Sr ˜ 0.7083; δ11B ˜ 48‰), although the δ18O-δ2H slope is identical to that of the Avedat aquitard. The geochemical data suggest that dissolution of pedogenic carbonate and gypsum minerals in the overlying loessial sequence generated the Ca-rich solution that triggered base exchange reactions and produced Na- and B-rich groundwater. The geochemical data show that most of the salinization process in the Gaza Strip is derived from the lateral flow of the Na-rich saline groundwater, superimposed with seawater intrusion and anthropogenic nitrate pollution. The methodology of identification of multiple salinity sources can be used to establish a long-term management plan for the Gaza Strip and can also be implemented to understand complex salinization processes in other similarly stressed coastal aquifers.

21 CFR 882.5900 - Preformed craniosynostosis strip.

Code of Federal Regulations, 2013 CFR

2013-04-01

... craniosynostosis strip. (a) Identification. A preformed craniosynostosis strip is a plastic strip used to cover bone edges of craniectomy sites (sites where the skull has been cut) to prevent the bone from regrowing...

High resolution energy-sensitive digital X-ray

DOEpatents

Nygren, David R.

1995-01-01

An apparatus and method for detecting an x-ray and for determining the depth of penetration of an x-ray into a semiconductor strip detector. In one embodiment, a semiconductor strip detector formed of semiconductor material is disposed in an edge-on orientation towards an x-ray source such that x-rays From the x-ray source are incident upon and substantially perpendicular to the front edge of the semiconductor strip detector. The semiconductor strip detector is formed of a plurality of segments. The segments are coupled together in a collinear arrangement such that the semiconductor strip detector has a length great enough such that substantially all of the x-rays incident on the front edge of the semiconductor strip detector interact with the semiconductor material which forms the semiconductor strip detector. A plurality of electrodes are connected to the semiconductor strip detect or such that each one of the of semiconductor strip detector segments has at least one of the of electrodes coupled thereto. A signal processor is also coupled to each one of the electrodes. The present detector detects an interaction within the semiconductor strip detector, between an x-ray and the semiconductor material, and also indicates the depth of penetration of the x-ray into the semiconductor strip detector at the time of the interaction.

GaN metal-oxide-semiconductor field-effect transistors on AlGaN/GaN heterostructure with recessed gate

NASA Astrophysics Data System (ADS)

Wang, Qingpeng; Ao, Jin-Ping; Wang, Pangpang; Jiang, Ying; Li, Liuan; Kawaharada, Kazuya; Liu, Yang

2015-04-01

GaN metal-oxide-semiconductor field-effect transistors (MOSFETs) on AlGaN/GaN heterostructure with a recess gate were fabricated and characterized. The device showed good pinch-off characteristics and a maximum field-effect mobility of 145.2 cm2·V-1·s-1. The effects of etching gas of Cl2 and SiCl4 were investigated in the gate recess process. SiCl4-etched devices showed higher channel mobility and lower threshold voltage. Atomic force microscope measurement was done to investigate the etching profile with different etching protection mask. Compared with photoresist, SiO2-masked sample showed lower surface roughness and better profile with stepper sidewall and weaker trenching effect resulting in higher channel mobility in the MOSFET.

Optimization of 248nm bottom anti-reflective coatings with thin film and high etch rate on real device

NASA Astrophysics Data System (ADS)

Kim, MyoungSoo; Kim, HakJoon; Shim, KewChan; Jeon, JeHa; Gil, MyungGoon; Song, YongWook; Enomoto, Tomoyuki; Sakaguchi, Takahiro; Nakajima, Yasuyuki

2005-05-01

A frequent problem encountered by photoresists during the manufacturing of semiconductor device is that activating radiation is reflected back into the photoresist by the substrate. So, it is necessary that the light reflection is reduced from the substrate. One approach to reduce the light reflection is the use of bottom anti-reflective coating (BARC) applied to the substrate beneath the photoresist layer. The BARC technology has been utilized for a few years to minimize the reflectivity. As the chip size is reduced to sub 100nm, the photoresist thickness has to decrease with the aspect ratio being less than 3.0. Therefore, new Organic BARC is strongly required which has the minimum reflectivity with thinner BARC thickness and higher etch selectivity toward resists. Hynix Semiconductor Inc., Nissan Chemical Industries, Ltd., and Brewer Science, Inc. have developed the advanced Organic BARC for achieving the above purpose. As a result, the suitable high performance 248nm Organic BARCs, NCA series, were achieved. Using CF4 gas as etchant, the plasma etch rate of NCA series is about 1.4 times higher than that of conventional 248nm resists. NCA series can be minimizing the substrate reflectivity at below 45nm BARC thickness. NCA series show the excellent litho performance and coating property on real device.

High resolution energy-sensitive digital X-ray

DOEpatents

Nygren, D.R.

1995-07-18

An apparatus and method for detecting an x-ray and for determining the depth of penetration of an x-ray into a semiconductor strip detector. In one embodiment, a semiconductor strip detector formed of semiconductor material is disposed in an edge-on orientation towards an x-ray source such that x-rays from the x-ray source are incident upon and substantially perpendicular to the front edge of the semiconductor strip detector. The semiconductor strip detector is formed of a plurality of segments. The segments are coupled together in a collinear arrangement such that the semiconductor strip detector has a length great enough such that substantially all of the x-rays incident on the front edge of the semiconductor strip detector interact with the semiconductor material which forms the semiconductor strip detector. A plurality of electrodes are connected to the semiconductor strip detector such that each one of the semiconductor strip detector segments has at least one of the of electrodes coupled thereto. A signal processor is also coupled to each one of the electrodes. The present detector detects an interaction within the semiconductor strip detector, between an x-ray and the semiconductor material, and also indicates the depth of penetration of the x-ray into the semiconductor strip detector at the time of the interaction. 5 figs.

Fabricating Blazed Diffraction Gratings by X-Ray Lithography

NASA Technical Reports Server (NTRS)

Mouroulis, Pantazis; Hartley, Frank; Wilson, Daniel

2004-01-01

Gray-scale x-ray lithography is undergoing development as a technique for fabricating blazed diffraction gratings. As such, gray-scale x-ray lithography now complements such other grating-fabrication techniques as mechanical ruling, holography, ion etching, laser ablation, laser writing, and electron-beam lithography. Each of these techniques offers advantages and disadvantages for implementing specific grating designs; no single one of these techniques can satisfy the design requirements for all applications. Gray-scale x-ray lithography is expected to be advantageous for making gratings on steeper substrates than those that can be made by electron-beam lithography. This technique is not limited to sawtooth groove profiles and flat substrates: various groove profiles can be generated on arbitrarily shaped (including highly curved) substrates with the same ease as sawtooth profiles can be generated on flat substrates. Moreover, the gratings fabricated by this technique can be made free of ghosts (spurious diffraction components attributable to small spurious periodicities in the locations of grooves). The first step in gray-scale x-ray lithography is to conformally coat a substrate with a suitable photoresist. An x-ray mask (see Figure 1) is generated, placed between the substrate and a source of collimated x-rays, and scanned over the substrate so as to create a spatial modulation in the exposure of the photoresist. Development of the exposed photoresist results in a surface corrugation that corresponds to the spatial modulation and that defines the grating surface. The grating pattern is generated by scanning an appropriately shaped x-ray area mask along the substrate. The mask example of Figure 1 would generate a blazed grating profile when scanned in the perpendicular direction at constant speed, assuming the photoresist responds linearly to incident radiation. If the resist response is nonlinear, then the mask shape can be modified to account for the nonlinearity and produce a desired groove profile. An example of grating grooves generated by this technique is shown in Figure 2. A maximum relative efficiency of 88 percent has been demonstrated.

Scalable fabrication of carbon-based MEMS/NEMS and their applications: a review

NASA Astrophysics Data System (ADS)

Jiang, Shulan; Shi, Tielin; Zhan, Xiaobin; Xi, Shuang; Long, Hu; Gong, Bo; Li, Junjie; Cheng, Siyi; Huang, Yuanyuan; Tang, Zirong

2015-11-01

The carbon-based micro/nano electromechanical system (MEMS/NEMS) technique provides a powerful approach to large-scale manufacture of high-aspect-ratio carbon structures for wafer-level processing. The fabricated three-dimensional (3D) carbon structures have the advantages of excellent electrical and electrochemical properties, and superior biocompatibility. In order to improve their performance for applications in micro energy storage devices and microsensors, an increase in the footprint surface area is of great importance. Various approaches have been proposed for fabricating large surface area carbon-based structures, including the integration of nanostructures such as carbon nanotubes (CNTs), graphene, nanowires, nanofilms and nanowrinkles onto 3D structures, which has been proved to be effective and productive. Moreover, by etching the 3D photoresist microstructures through oxygen plasma or modifying the photoresist with specific materials which can be etched in the following pyrolysis process, micro/nano hierarchical carbon structures have been fabricated. These improved structures show excellent performance in various applications, especially in the fields of biological sensors, surface-enhanced Raman scattering, and energy storage devices such as micro-supercapacitors and fuel cells. With the rapid development of microelectronic devices, the carbon-based MEMS/NEMS technique could make more aggressive moves into microelectronics, sensors, miniaturized power systems, etc. In this review, the recent advances in the fabrication of micro/nano hierarchical carbon-based structures are introduced and the technical challenges and future outlook of the carbon-based MEMS/NEMS techniques are also analyzed.

Gray scale x-ray mask

DOEpatents

Morales, Alfredo M [Livermore, CA; Gonzales, Marcela [Seattle, WA

2006-03-07

The present invention describes a method for fabricating an embossing tool or an x-ray mask tool, providing microstructures that smoothly vary in height from point-to-point in etched substrates, i.e., structure which can vary in all three dimensions. The process uses a lithographic technique to transfer an image pattern in the surface of a silicon wafer by exposing and developing the resist and then etching the silicon substrate. Importantly, the photoresist is variably exposed so that when developed some of the resist layer remains. The remaining undeveloped resist acts as an etchant barrier to the reactive plasma used to etch the silicon substrate and therefore provides the ability etch structures of variable depths.

Silicon web process development

NASA Technical Reports Server (NTRS)

Duncan, C. S.; Seidensticker, R. G.; Mchugh, J. P.; Skutch, M. E.; Driggers, J. M.; Hopkins, R. H.

1981-01-01

The silicon web process takes advantage of natural crystallographic stabilizing forces to grow long, thin single crystal ribbons directly from liquid silicon. The ribbon, or web, is formed by the solidification of a liquid film supported by surface tension between two silicon filaments, called dendrites, which border the edges of the growing strip. The ribbon can be propagated indefinitely by replenishing the liquid silicon as it is transformed to crystal. The dendritic web process has several advantages for achieving low cost, high efficiency solar cells. These advantages are discussed.

Visual detection of Ebola virus using reverse transcription loop-mediated isothermal amplification combined with nucleic acid strip detection.

PubMed

Xu, Changping; Wang, Hualei; Jin, Hongli; Feng, Na; Zheng, Xuexing; Cao, Zengguo; Li, Ling; Wang, Jianzhong; Yan, Feihu; Wang, Lina; Chi, Hang; Gai, Weiwei; Wang, Chong; Zhao, Yongkun; Feng, Yan; Wang, Tiecheng; Gao, Yuwei; Lu, Yiyu; Yang, Songtao; Xia, Xianzhu

2016-05-01

Ebola virus (species Zaire ebolavirus) (EBOV) is highly virulent in humans. The largest recorded outbreak of Ebola hemorrhagic fever in West Africa to date was caused by EBOV. Therefore, it is necessary to develop a detection method for this virus that can be easily distributed and implemented. In the current study, we developed a visual assay that can detect EBOV-associated nucleic acids. This assay combines reverse transcription loop-mediated isothermal amplification and nucleic acid strip detection (RT-LAMP-NAD). Nucleic acid amplification can be achieved in a one-step process at a constant temperature (58 °C, 35 min), and the amplified products can be visualized within 2-5 min using a nucleic acid strip detection device. The assay is capable of detecting 30 copies of artificial EBOV glycoprotein (GP) RNA and RNA encoding EBOV GP from 10(2) TCID50 recombinant viral particles per ml with high specificity. Overall, the RT-LAMP-NAD method is simple and has high sensitivity and specificity; therefore, it is especially suitable for the rapid detection of EBOV in African regions.

Microscale patterning of thermoplastic polymer surfaces by selective solvent swelling.

PubMed

Rahmanian, Omid; Chen, Chien-Fu; DeVoe, Don L

2012-09-04

A new method for the fabrication of microscale features in thermoplastic substrates is presented. Unlike traditional thermoplastic microfabrication techniques, in which bulk polymer is displaced from the substrate by machining or embossing, a unique process termed orogenic microfabrication has been developed in which selected regions of a thermoplastic surface are raised from the substrate by an irreversible solvent swelling mechanism. The orogenic technique allows thermoplastic surfaces to be patterned using a variety of masking methods, resulting in three-dimensional features that would be difficult to achieve through traditional microfabrication methods. Using cyclic olefin copolymer as a model thermoplastic material, several variations of this process are described to realize growth heights ranging from several nanometers to tens of micrometers, with patterning techniques include direct photoresist masking, patterned UV/ozone surface passivation, elastomeric stamping, and noncontact spotting. Orogenic microfabrication is also demonstrated by direct inkjet printing as a facile photolithography-free masking method for rapid desktop thermoplastic microfabrication.

DOE Office of Scientific and Technical Information (OSTI.GOV)

DE GERONIMO,G.; FRIED, J.; FROST, E.

We describe a front-end application specific integrated circuit (ASIC) developed for a silicon Compton telescope. Composed of 32 channels, it reads out signals in both polarities from each side of a Silicon strip sensor, 2 mm thick 27 cm long, characterized by a strip capacitance of 30 pF. Each front-end channel provides low-noise charge amplification, shaping with a stabilized baseline, discrimination, and peak detection with an analog memory. The channels can process events simultaneously, and the read out is sparsified. The charge amplifier makes uses a dual-cascode configuration and dual-polarity adaptive reset, The low-hysteresis discriminator and the multi-phase peak detectormore » process signals with a dynamic range in excess of four hundred. An equivalent noise charge (ENC) below 200 electrons was measured at 30 pF, with a slope of about 4.5 electrons/pF at a peaking time of 4 {micro}s. With a total dissipated power of 5 mW the channel covers an energy range up to 3.2 MeV.« less

Reductive stripping process for uranium recovery from organic extracts

DOEpatents

Hurst, Jr., Fred J.

1985-01-01

In the reductive stripping of uranium from an organic extractant in a uranium recovery process, the use of phosphoric acid having a molarity in the range of 8 to 10 increases the efficiency of the reductive stripping and allows the strip step to operate with lower aqueous to organic recycle ratios and shorter retention time in the mixer stages. Under these operating conditions, less solvent is required in the process, and smaller, less expensive process equipment can be utilized. The high strength H.sub.3 PO.sub.4 is available from the evaporator stage of the process.

Antenna with distributed strip and integrated electronic components

DOEpatents

Rodenbeck, Christopher T [Albuquerque, NM; Payne, Jason A [Albuquerque, NM; Ottesen, Cory W [Albuquerque, NM

2008-08-05

An antenna comprises electrical conductors arranged to form a radiating element including a folded line configuration and a distributed strip configuration, where the radiating element can be in proximity to a ground conductor and/or arranged as a dipole. Embodiments of the antenna include conductor patterns formed on a printed wiring board, having a ground plane, spacedly adjacent to and coplanar with the radiating element. An antenna can comprise a distributed strip patterned on a printed wiring board, integrated with electronic components mounted on top of or below the distributed strip, and substantially within the extents of the distributed strip. Mounting of electronic components on top of or below the distributed strip has little effect on the performance of the antenna, and allows for realizing the combination of the antenna and integrated components in a compact form. An embodiment of the invention comprises an antenna including a distributed strip, integrated with a battery mounted on the distributed strip.

Fabricating PFPE Membranes for Capillary Electrophoresis

NASA Technical Reports Server (NTRS)

Lee, Michael C.; Willis, Peter A.; Greer, Frank; Rolland, Jason

2009-01-01

A process has been developed for fabricating perfluoropolyether (PFPE) membranes that contain microscopic holes of precise sizes at precise locations. The membranes are to be incorporated into laboratory-on-a-chip microfluidic devices to be used in performing capillary electrophoresis. The present process is a modified version of part of the process, described in the immediately preceding article, that includes a step in which a liquid PFPE layer is cured into solid (membrane) form by use of ultraviolet light. In the present process, one exploits the fact that by masking some locations to prevent exposure to ultraviolet light, one can prevent curing of the PFPE in those locations. The uncured PFPE can be washed away from those locations in the subsequent release and cleaning steps. Thus, holes are formed in the membrane in those locations. The most straightforward way to implement the modification is to use, during the ultraviolet-curing step, an ultraviolet photomask similar to the photomasks used in fabricating microelectronic devices. In lieu of such a photomask, one could use a mask made of any patternable ultraviolet-absorbing material (for example, an ink or a photoresist).

Geometrical principles of homomeric β-barrels and β-helices: Application to modeling amyloid protofilaments.

PubMed

Hayward, Steven; Milner-White, E James

2017-10-01

Examples of homomeric β-helices and β-barrels have recently emerged. Here we generalize the theory for the shear number in β-barrels to encompass β-helices and homomeric structures. We introduce the concept of the "β-strip," the set of parallel or antiparallel neighboring strands, from which the whole helix can be generated giving it n-fold rotational symmetry. In this context, the shear number is interpreted as the sum around the helix of the fixed register shift between neighboring identical β-strips. Using this approach, we have derived relationships between helical width, pitch, angle between strand direction and helical axis, mass per length, register shift, and number of strands. The validity and unifying power of the method is demonstrated with known structures including α-hemolysin, T4 phage spike, cylindrin, and the HET-s(218-289) prion. From reported dimensions measured by X-ray fiber diffraction on amyloid fibrils, the relationships can be used to predict the register shift and the number of strands within amyloid protofilaments. This was used to construct models of transthyretin and Alzheimer β(40) amyloid protofilaments that comprise a single strip of in-register β-strands folded into a "β-strip helix." Results suggest both stabilization of an individual β-strip helix and growth by addition of further β-strip helices can involve the same pair of sequence segments associating with β-sheet hydrogen bonding at the same register shift. This process would be aided by a repeat sequence. Hence, understanding how the register shift (as the distance between repeat sequences) relates to helical dimensions will be useful for nanotube design. © 2017 Wiley Periodicals, Inc.

Sources of salinity and boron in the Gaza strip: Natural contaminant flow in the southern Mediterranean coastal aquifer

NASA Astrophysics Data System (ADS)

Vengosh, Avner; Kloppmann, Wolfram; Marei, Amer; Livshitz, Yakov; Gutierrez, Alexis; Banna, Mazen; Guerrot, Catherine; Pankratov, Irena; Raanan, Hadas

2005-01-01

Salinization in coastal aquifers is a global phenomenon resulting from the overexploitation of scarce water resources. The Gaza Strip is one of the most severe cases of salinization, as accelerated degradation of the water quality endangers the present and future water supply for over 1 million people. We investigate the chemical and isotopic (87Sr/86Sr, δ11B, δ18O, δ2H, and δ34SSO4) compositions of groundwater from the southern Mediterranean coastal aquifer (Israel) and the Gaza Strip in order to elucidate the origin of salinity and boron contamination. The original salinity in the eastern part of the aquifer is derived from discharge of saline groundwater from the adjacent Avedat aquitard (Na/Cl < 1, 87Sr/86Sr ~ 0.7079, and δ11B ~ 40‰). As the groundwater flows to the central part of the aquifer, a dramatic change in its composition occurs (Na/Cl > 1, high B/Cl, SO4/Cl, and HCO3, 87Sr/86Sr ~ 0.7083; δ11B ~ 48‰), although the δ18O-δ2H slope is identical to that of the Avedat aquitard. The geochemical data suggest that dissolution of pedogenic carbonate and gypsum minerals in the overlying loessial sequence generated the Ca-rich solution that triggered base exchange reactions and produced Na- and B-rich groundwater. The geochemical data show that most of the salinization process in the Gaza Strip is derived from the lateral flow of the Na-rich saline groundwater, superimposed with seawater intrusion and anthropogenic nitrate pollution. The methodology of identification of multiple salinity sources can be used to establish a long-term management plan for the Gaza Strip and can also be implemented to understand complex salinization processes in other similarly stressed coastal aquifers.

Demonstration of the TRUEX process for partitioning of actinides from actual ICPP tank waste using centrifugal contactors in a shielded cell facility

DOE Office of Scientific and Technical Information (OSTI.GOV)

Law, J.D.; Brewer, K.N.; Herbst, R.S.

1996-09-01

TRUEX is being evaluated at Idaho Chemical Processing Plant (ICPP) for separating actinides from acidic radioactive waste stored at ICPP; efforts have culminated in a recent demonstration with actual tank waste. A continuous countercurrent flowsheet test was successfully completed at ICPP using waste from tank WM-183. This demonstration was performed using 24 states of 2-cm dia centrifugal contactors in the shielded hot cell at the ICPP Remote Analytical Laboratory. The flowsheet had 8 extraction stages, 5 scrub stages, 6 strip stages, 3 solvent wash stages, and 2 acid rinse stages. A centrifugal contactor stage in the scrub section was notmore » working during testing, and the scrub feed (aqueous) solution followed the solvent into the strip section, eliminating the scrub section in the flowsheet. An overall removal efficiency of 99.97% was obtained for the actinides, reducing the activity from 457 nCi/g in the feed to 0.12 nCi/g in the aqueous raffinate, well below the NRC Class A LLW requirement of 10 nCi/g for non-TRU waste.The 0.04 M HEDPA strip section back-extracted 99.9998% of the actinide from the TRUEX solvent. Removal efficiencies of >99. 90, 99.96, 99.98, >98.89, 93.3, and 89% were obtained for {sup 241}Am, {sup 238}Pu, {sup 239}Pu, {sup 235}U, {sup 238}U, and {sup 99}Tc. Fe was partially extracted by the TRUEX solvent, resulting in 23% of the Fe exiting in the strip product. Hg was also extracted by the TRUEX solvent (73%) and stripped from the solvent in the 0.25 M Na2CO3 wash section. Only 1.4% of the Hg exited with the high activity waste strip product.« less

Herpin effective media resonant underlayers and resonant overlayer designs for ultra-high NA interference lithography.

PubMed

Bourke, Levi; Blaikie, Richard J

2017-12-01

Dielectric waveguide resonant underlayers are employed in ultra-high NA interference photolithography to effectively double the depth of field. Generally a single high refractive index waveguiding layer is employed. Here multilayer Herpin effective medium methods are explored to develop equivalent multilayer waveguiding layers. Herpin equivalent resonant underlayers are shown to be suitable replacements provided at least one layer within the Herpin trilayer supports propagating fields. In addition, a method of increasing the intensity incident upon the photoresist using resonant overlayers is also developed. This method is shown to greatly enhance the intensity within the photoresist making the use of thicker, safer, non-absorbing, low refractive index matching liquids potentially suitable for large-scale applications.

Thin film type 248-nm bottom antireflective coatings

NASA Astrophysics Data System (ADS)

Enomoto, Tomoyuki; Nakayama, Keisuke; Mizusawa, Kenichi; Nakajima, Yasuyuki; Yoon, Sangwoong; Kim, Yong-Hoon; Kim, Young-Ho; Chung, Hoesik; Chon, Sang Mun

2003-06-01

A frequent problem encountered by photoresists during the manufacturing of semiconductor device is that activating radiation is reflected back into the photoresist by the substrate. So, it is necessary that the light reflection is reduced from the substrate. One approach to reduce the light reflection is the use of bottom anti-reflective coating (BARC) applied to the substrate beneath the photoresist layer. The BARC technology has been utilized for a few years to minimize the reflectivity. As the chip size is reduced to sub 0.13-micron, the photoresist thickness has to decrease with the aspect ratio being less than 3.0. Therefore, new Organic BARC is strongly required which has the minimum reflectivity with thinner BARC thickness and higher etch selectivity towards resist. SAMSUNG Electronics has developed the advanced Organic BARC with Nissan Chemical Industries, Ltd. and Brewer Science, Inc. for achieving the above purpose. As a result, the suitable high performance SNAC2002 series KrF Organic BARCs were developed. Using CF4 gas as etchant, the plasma etch rate of SNAC2002 series is about 1.4 times higher than that of conventional KrF resists and 1.25 times higher than the existing product. The SNAC2002 series can minimize the substrate reflectivity at below 40nm BARC thickness, shows excellent litho performance and coating properties.

Thin film and high-etch-rate type 248-nm bottom antireflective coatings

NASA Astrophysics Data System (ADS)

Enomoto, Tomoyuki; Takei, Satoshi; Kishioka, Takahiro; Hatanaka, Tadashi; Sakamoto, Rikimaru; Nakajima, Yasuyuki

2004-05-01

A frequent problem encountered by photoresists during the manufacturing of semiconductor device is that activating radiation is reflected back into the photoresist by the substrate. So, it is necessary that the light reflection is reduced from the substrate. One approach to reduce the light reflection is the use of bottom anti-reflective coating (BARC) applied to the substrate beneath the photoresist layer. The BARC technology has been utilized for a few years to minimize the reflectivity. As the chip size is reduced to sub 0.13 micron, the photoresist thickness has to decrease with the aspect ratio being less than 3.0. Therefore, new Organic BARC is strongly required which has the minimum reflectivity with thinner BARC thickness and higher etch selectivity toward resists. Nissan Chemical Industries, Ltd. and Brewer Science, Inc. have developed the advanced Organic BARC for achieving the above purpose. As a result, the suitable high performance NCA3000 series 248nm Organic BARCs were developed. Using CF4 gas as etchant, the plasma etch rate of NCA3000 series is about 1.4-1.6 times higher than that of conventional 248nm resists and 1.1-1.2 times higher than that of the existing product. The NCA3000 series can minimize the substrate reflectivity at below 45nm BARC thickness, shows excellent litho performance and coating properties.

Reductive stripping process for uranium recovery from organic extracts

DOEpatents

Hurst, F.J. Jr.

1983-06-16

In the reductive stripping of uranium from an organic extractant in a uranium recovery process, the use of phosphoric acid having a molarity in the range of 8 to 10 increases the efficiency of the reductive stripping and allows the strip step to operate with lower aqueous to organic recycle ratios and shorter retention time in the mixer stages. Under these operating conditions, less solvent is required in the process, and smaller, less expensive process equipment can be utilized. The high strength H/sub 3/PO/sub 4/ is available from the evaporator stage of the process.

Nanostructures and functional materials fabricated by interferometric lithography.

PubMed

Xia, Deying; Ku, Zahyun; Lee, S C; Brueck, S R J

2011-01-11

Interferometric lithography (IL) is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium, such as a photoresist, that responds nonlinearly to the intensity distribution associated with the interference of two or more coherent beams of light. The photoresist patterns produced with IL are a platform for further fabrication of nanostructures and growth of functional materials and are building blocks for devices. This article provides a brief review of IL technologies and focuses on various applications for nanostructures and functional materials based on IL including directed self-assembly of colloidal nanoparticles, nanophotonics, semiconductor materials growth, and nanofluidic devices. Perspectives on future directions for IL and emerging applications in other fields are presented.

21 CFR 882.5900 - Preformed craniosynostosis strip.

Code of Federal Regulations, 2011 CFR

2011-04-01

... craniosynostosis strip. (a) Identification. A preformed craniosynostosis strip is a plastic strip used to cover bone edges of craniectomy sites (sites where the skull has been cut) to prevent the bone from regrowing...

21 CFR 882.5900 - Preformed craniosynostosis strip.

Code of Federal Regulations, 2012 CFR

2012-04-01

... craniosynostosis strip. (a) Identification. A preformed craniosynostosis strip is a plastic strip used to cover bone edges of craniectomy sites (sites where the skull has been cut) to prevent the bone from regrowing...

LITERATURE REVIEW OF BORIC ACID SOLUBILITY DATA

DOE Office of Scientific and Technical Information (OSTI.GOV)

Crapse, K.; Kyser, E.

2011-09-22

A new solvent system is being evaluated for use in the Modular Caustic-Side Solvent Extraction Unit (MCU) and in the Salt Waste Processing Facility (SWPF). The new system replaces the current dilute nitric acid strip solution with 0.01 M boric acid. This literature study is performed to determine if there is a potential for boric acid to crystallize in the lines with emphasis on the transfer lines to the Defense Waste Processing Facility. This report focuses on the aqueous phase chemistry of boric acid under conditions relevant to MCU and SWPF. Operating and transfer conditions examined for the purpose ofmore » this review include temperatures between 13 C (McLeskey, 2008) and 45 C (Fondeur, 2007) and concentrations from 0 to 3M in nitric acid as well as exposure of small amounts of entrained boric acid in the organic phase to the sodium hydroxide caustic wash stream. Experiments were also conducted to observe any chemical reactions and off-gas generation that could occur when 0.01 M boric acid solution mixes with 3 M nitric acid solution and vice versa. Based on the low concentration (0.01M) of boric acid in the MCU/SWPF strip acid and the moderate operating temperatures (13 C to 45 C), it is unlikely that crystallization of boric acid will occur in the acid strip solution under process or transfer conditions. Mixing experiments of boric and nitric acid show no measurable gas generation (< 1 cc of gas per liter of solution) under similar process conditions.« less

Microtube strip heat exchanger

NASA Astrophysics Data System (ADS)

Doty, F. D.

1991-04-01

During the last quarter, Doty Scientific, Inc. (DSI) continued to make progress on the microtube strip (MTS) heat exchangers. The team has begun a heat exchanger stress analysis; however, they have been concentrating the bulk of their analytical energies on a computational fluid dynmaics (CFD) model to determine the location and magnitude of shell-side flow maldistribution which decreases heat exchanger effectiveness. DSI received 120 fineblanked tubestrips from Southern Fineblanking (SFB) for manufacturing process development. Both SFB and NIST provided inspection reports of the tubestrips. DSI completed the tooling required to encapsulate a tube array and press tubestrips on the array. Pressing the tubestrips on tube arrays showed design deficiencies both in the tubestrip design and the tooling design. DSI has a number of revisions in process to correct these deficiencies. The research effort has identified a more economical fusible alloy for encapsulating the tube array, and determined the parameters required to successfully encapsulate the tube array with the new alloy. A more compact MTS heat exchanger bank was designed.

Roll Casting of Aluminum Alloy Clad Strip

DOE Office of Scientific and Technical Information (OSTI.GOV)

Nakamura, R.; Tsuge, H.; Haga, T.

2011-01-17

Casting of aluminum alloy three layers of clad strip was tried using the two sets of twin roll casters, and effects of the casting parameters on the cladding conditions were investigated. One twin roll caster was mounted on the other twin roll caster. Base strip was 8079 aluminum alloy and overlay strips were 6022 aluminum alloy. Effects of roll-load of upper and lower casters and melt temperature of the lower caster were investigated. When the roll-load of the upper and lower caster was large enough, the overlay strip could be solidified and be connected. The overlay strip could be connectedmore » when the melt of the overlay strip cast by the lower caster was low enough. Sound three layers of clad strip could be cast by proper conditions.« less

Regenerating an Arsenic Removal Iron-Based Adsorptive ...

EPA Pesticide Factsheets

Adsorptive media technology is a frequently used method of removing arsenic by small water systems because of its simplicity and efficiency. Current practice is to replace the media when it no longer reduces arsenic below the USEPA drinking water maximum contaminant level (MCL) of 10 µg/L. Media replacement typically accounts for approximately 80% of the total operational and maintenance (O/M) costs. This cost can be substantial and cost prohibitive for many small systems. One potential option to reduce the cost is on-site regeneration and reuse of the media. To evaluate the regeneration option, three consecutive regeneration studies were conducted on a full scale 295 gpm arsenic removal adsorptive media system. This paper, of a two part series, describes the regeneration process and its effectiveness to strip the arsenic and other contaminants from an exhausted media. The results of the regeneration studies found that a three step regeneration process of media backwash, caustic regeneration and acid neutralization/conditioning is very effective for stripping arsenic and other contaminants from the exhaustive media of a full scale arsenic removal system This paper, of a two part series, describes the regeneration process and its effectiveness to strip the arsenic and other contaminants from an exhausted media

Impedance of strip-traveling waves on an elastic half space - Asymptotic solution

NASA Technical Reports Server (NTRS)

Crandall, S. H.; Nigam, A. K.

1973-01-01

The dynamic normal-load distribution across a strip that is required to maintain a plane progressive wave along its length is studied for the case where the strip is of infinite length and lies on the surface of a homogeneous isotropic elastic half space. This configuration is proposed as a preliminary idealized model for analyzing the dynamic interaction between soils and flexible foundations. The surface load distribution across the strip and the motion of the strip are related by a pair of dual integral equations. An asymptotic solution is obtained for the limiting case of small wavelength. The nature of this solution depends importantly on the propagation velocity of the strip-traveling wave in comparison with the Rayleigh wave speed, the shear wave speed and the dilatational wave speed. When the strip-traveling wave propagates faster than the Rayleigh wave speed, a pattern of trailing Rayleigh waves is shed from the strip. The limiting amplitude of the trailing waves is provided by the asymptotic solution.

Evaluation of the Hydraulic Performance and Mass Transfer Efficiency of the CSSX Process with the Optimized Solvent in a Single Stage of 5.5-Cm Diameter Centrifugal Contactor

DOE Office of Scientific and Technical Information (OSTI.GOV)

Law, J.D.; Tillotson, R.D.; Todd, T.A.

2002-09-19

The Caustic-Side Solvent Extraction (CSSX) process has been selected for the separation of cesium from Savannah River Site high-level waste. The solvent composition used in the CSSX process was recently optimized so that the solvent is no longer supersaturated with respect to the calixarene crown ether extractant. Hydraulic performance and mass transfer efficiency testing of a single stage of 5.5-cm ORNL-designed centrifugal contactor has been performed for the CSSX process with the optimized solvent. Maximum throughputs of the 5.5-cm centrifugal contactor, as a function of contactor rotor speed, have been measured for the extraction, scrub, strip, and wash sections ofmore » the CSSX flowsheet at the baseline organic/aqueous flow ratios (O/A) of the process, as well as at O/A's 20% higher and 20% lower than the baseline. Maximum throughputs are comparable to the design throughput of the contactor, as well as with throughputs obtained previously in a 5-cm centrifugal contactor with the non-optimized CSSX solvent formulation. The 20% variation in O/A had minimal effect on contactor throughput. Additionally, mass transfer efficiencies have been determined for the extraction and strip sections of the flowsheet. Efficiencies were lower than the process goal of greater than or equal to 80%, ranging from 72 to 75% for the extraction section and from 36 to 60% in the strip section. Increasing the mixing intensity and/or the solution level in the mixing zone of the centrifugal contactor (residence time) could potentially increase efficiencies. Several methods are available to accomplish this including (1) increasing the size of the opening in the bottom of the rotor, resulting in a contactor which is partially pumping instead of fully pumping, (2) decreasing the number of vanes in the contactor, (3) increasing the vane height, or (4) adding vanes on the rotor and baffles on the housing of the contactor. The low efficiency results obtained stress the importance of proper design of a centrifugal contactor for use in the CSSX process. A prototype of any centrifugal contactors designed for future pilot-scale or full-scale processing should be thoroughly tested prior to implementation.« less

Evaluation of the Hydraulic Capacity and Mass Transfer Efficiency of the CSSX Process with the Optimized Solvent in a Single Stage of 5.5-cm-Diameter Centrifugal Contactor

DOE Office of Scientific and Technical Information (OSTI.GOV)

Law, Jack Douglas; Tillotson, Richard Dean; Todd, Terry Allen

2002-09-01

The Caustic-Side Solvent Extraction (CSSX) process has been selected for the separation of cesium from Savannah River Site high-level waste. The solvent composition used in the CSSX process was recently optimized so that the solvent is no longer supersaturated with respect to the calixarene crown ether extractant. Hydraulic performance and mass transfer efficiency testing of a single stage of 5.5-cm ORNL-designed centrifugal contactor has been performed for the CSSX process with the optimized solvent. Maximum throughputs of the 5.5-cm centrifugal contactor, as a function of contactor rotor speed, have been measured for the extraction, scrub, strip, and wash sections ofmore » the CSSX flowsheet at the baseline organic/aqueous flow ratios (O/A) of the process, as well as at O/A’s 20% higher and 20% lower than the baseline. Maximum throughputs are comparable to the design throughput of the contactor, as well as with throughputs obtained previously in a 5-cm centrifugal contactor with the non-optimized CSSX solvent formulation. The 20% variation in O/A had minimal effect on contactor throughput. Additionally, mass transfer efficiencies have been determined for the extraction and strip sections of the flowsheet. Efficiencies were lower than the process goal of greater than or equal to 80%, ranging from 72 to 75% for the extraction section and from 36 to 60% in the strip section. Increasing the mixing intensity and/or the solution level in the mixing zone of the centrifugal contactor (residence time) could potentially increase efficiencies. Several methods are available to accomplish this including (1) increasing the size of the opening in the bottom of the rotor, resulting in a contactor which is partially pumping instead of fully pumping, (2) decreasing the number of vanes in the contactor, (3) increasing the vane height, or (4) adding vanes on the rotor and baffles on the housing of the contactor. The low efficiency results obtained stress the importance of proper design of a centrifugal contactor for use in the CSSX process. A prototype of any centrifugal contactors designed for future pilot-scale or full-scale processing should be thoroughly tested prior to implementation.« less

Microscopic analysis and simulation of check-mark stain on the galvanized steel strip

NASA Astrophysics Data System (ADS)

So, Hongyun; Yoon, Hyun Gi; Chung, Myung Kyoon

2010-11-01

When galvanized steel strip is produced through a continuous hot-dip galvanizing process, the thickness of adhered zinc film is controlled by plane impinging air gas jet referred to as "air-knife system". In such a gas-jet wiping process, stain of check-mark or sag line shape frequently appears. The check-mark defect is caused by non-uniform zinc coating and the oblique patterns such as "W", "V" or "X" on the coated surface. The present paper presents a cause and analysis of the check-mark formation and a numerical simulation of sag lines by using the numerical data produced by Large Eddy Simulation (LES) of the three-dimensional compressible turbulent flow field around the air-knife system. It was found that there is alternating plane-wise vortices near the impinging stagnation region and such alternating vortices move almost periodically to the right and to the left sides on the stagnation line due to the jet flow instability. Meanwhile, in order to simulate the check-mark formation, a novel perturbation model has been developed to predict the variation of coating thickness along the transverse direction. Finally, the three-dimensional zinc coating surface was obtained by the present perturbation model. It was found that the sag line formation is determined by the combination of the instantaneous coating thickness distribution along the transverse direction near the stagnation line and the feed speed of the steel strip.

Process Performance of Optima XEx Single Wafer High Energy Implanter

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kim, J. H.; Yoon, Jongyoon; Kondratenko, S.

2011-01-07

To meet the process requirements for well formation in future CMOS memory production, high energy implanters require more robust angle, dose, and energy control while maintaining high productivity. The Optima XEx high energy implanter meets these requirements by integrating a traditional LINAC beamline with a robust single wafer handling system. To achieve beam angle control, Optima XEx can control both the horizontal and vertical beam angles to within 0.1 degrees using advanced beam angle measurement and correction. Accurate energy calibration and energy trim functions accelerate process matching by eliminating energy calibration errors. The large volume process chamber and UDC (upstreammore » dose control) using faraday cups outside of the process chamber precisely control implant dose regardless of any chamber pressure increase due to PR (photoresist) outgassing. An optimized RF LINAC accelerator improves reliability and enables singly charged phosphorus and boron energies up to 1200 keV and 1500 keV respectively with higher beam currents. A new single wafer endstation combined with increased beam performance leads to overall increased productivity. We report on the advanced performance of Optima XEx observed during tool installation and volume production at an advanced memory fab.« less

Stability of barotropic vortex strip on a rotating sphere.

PubMed

Sohn, Sung-Ik; Sakajo, Takashi; Kim, Sun-Chul

2018-02-01

We study the stability of a barotropic vortex strip on a rotating sphere, as a simple model of jet streams. The flow is approximated by a piecewise-continuous vorticity distribution by zonal bands of uniform vorticity. The linear stability analysis shows that the vortex strip becomes stable as the strip widens or the rotation speed increases. When the vorticity constants in the upper and the lower regions of the vortex strip have the same positive value, the inner flow region of the vortex strip becomes the most unstable. However, when the upper and the lower vorticity constants in the polar regions have different signs, a complex pattern of instability is found, depending on the wavenumber of perturbations, and interestingly, a boundary far away from the vortex strip can be unstable. We also compute the nonlinear evolution of the vortex strip on the rotating sphere and compare with the linear stability analysis. When the width of the vortex strip is small, we observe a good agreement in the growth rate of perturbation at an early time, and the eigenvector corresponding to the unstable eigenvalue coincides with the most unstable part of the flow. We demonstrate that a large structure of rolling-up vortex cores appears in the vortex strip after a long-time evolution. Furthermore, the geophysical relevance of the model to jet streams of Jupiter, Saturn and Earth is examined.

Microplasma generator and methods therefor

DOEpatents

Hopwood, Jeffrey A

2015-04-14

A low-temperature, atmospheric-pressure microplasma generator comprises at least one strip of metal on a dielectric substrate. A first end of the strip is connected to a ground plane and the second end of the strip is adjacent to a grounded electrode, with a gap being defined between the second end of the strip and the grounded electrode. High frequency power is supplied to the strip. The frequency is selected so that the length of the strip is an odd integer multiple of 1/4 of the wavelength traveling on the strip. A microplasma forms in the gap between the second end of the strip and the grounded electrode due to electric fields in that region. A microplasma generator array comprises a plurality of strongly-coupled resonant strips in close proximity to one another. At least one of the strips has an input for high-frequency electrical power. The remaining strips resonate due to coupling from the at least one powered strip. The array can provide a continuous line or ring of plasma. The microplasma generator can be used to alter the surface of a substrate, such as by adding material (deposition), removal of material (etching), or modifying surface chemistry.

75 FR 49900 - Polyethylene Terephthalate Film, Sheet, and Strip From Brazil: Preliminary Results of Antidumping...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-08-16

... Film, Sheet, and Strip From Brazil: Preliminary Results of Antidumping Duty Administrative Review... on polyethylene terephthalate film, sheet, and strip (PET film) from Brazil. This administrative... on PET film from Brazil. See Polyethylene Terephthalate Film, Sheet, and Strip From Brazil, the...

76 FR 48122 - Polyethylene Terephthalate Film, Sheet, and Strip From Brazil: Preliminary Results of Antidumping...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-08-08

... Film, Sheet, and Strip From Brazil: Preliminary Results of Antidumping Duty Administrative Review... on polyethylene terephthalate film, sheet, and strip (PET film) from Brazil. This administrative... antidumping duty order on PET film from Brazil. See Polyethylene Terephthalate Film, Sheet, and Strip From...

Stability of barotropic vortex strip on a rotating sphere

PubMed Central

Sohn, Sung-Ik; Kim, Sun-Chul

2018-01-01

We study the stability of a barotropic vortex strip on a rotating sphere, as a simple model of jet streams. The flow is approximated by a piecewise-continuous vorticity distribution by zonal bands of uniform vorticity. The linear stability analysis shows that the vortex strip becomes stable as the strip widens or the rotation speed increases. When the vorticity constants in the upper and the lower regions of the vortex strip have the same positive value, the inner flow region of the vortex strip becomes the most unstable. However, when the upper and the lower vorticity constants in the polar regions have different signs, a complex pattern of instability is found, depending on the wavenumber of perturbations, and interestingly, a boundary far away from the vortex strip can be unstable. We also compute the nonlinear evolution of the vortex strip on the rotating sphere and compare with the linear stability analysis. When the width of the vortex strip is small, we observe a good agreement in the growth rate of perturbation at an early time, and the eigenvector corresponding to the unstable eigenvalue coincides with the most unstable part of the flow. We demonstrate that a large structure of rolling-up vortex cores appears in the vortex strip after a long-time evolution. Furthermore, the geophysical relevance of the model to jet streams of Jupiter, Saturn and Earth is examined. PMID:29507524

Strip-Bark Morphology and Radial Growth Trends in Ancient Pinus sibirica Trees From Central Mongolia

NASA Astrophysics Data System (ADS)

Leland, Caroline; Cook, Edward R.; Andreu-Hayles, Laia; Pederson, Neil; Hessl, Amy; Anchukaitis, Kevin J.; Byambasuren, Oyunsanaa; Nachin, Baatarbileg; Davi, Nicole; D'Arrigo, Rosanne; Griffin, Kevin; Bishop, Daniel A.; Rao, Mukund Palat

2018-03-01

Some of the oldest and most important trees used for dendroclimatic reconstructions develop strip-bark morphology, in which only a portion of the stem contains living tissue. Yet the ecophysiological factors initiating strip bark and the potential effect of cambial dieback on annual ring widths and tree-ring estimates of past climate remain poorly understood. Using a combination of field observations and tree-ring data, we investigate the causes and timing of cambial dieback events in Pinus sibirica strip-bark trees from central Mongolia and compare the radial growth rates and trends of strip-bark and whole-bark trees over the past 515 years. Results indicate that strip bark is more common on the southern aspect of trees, and dieback events were most prevalent in the 19th century, a cold and dry period. Further, strip-bark and whole-bark trees have differing centennial trends, with strip-bark trees exhibiting notably large increases in ring widths at the beginning of the 20th century. We find a steeper positive trend in the strip-bark chronology relative to the whole-bark chronology when standardizing with age-dependent splines. We hypothesize that localized warming on the southern side of stems due to solar irradiance results in physiological damage and dieback and leads to increasing tree-ring increment along the living portion of strip-bark trees. Because the impact of cambial dieback on ring widths likely varies depending on species and site, we suggest conducting a comparison of strip-bark and whole-bark ring widths before statistically treating ring-width data for climate reconstructions.

Three Dimensional Microfabrication On Thick Film Photoresist Mandrels

NASA Astrophysics Data System (ADS)

Salmre, William

1984-05-01

Small, three-dimensional structures are fabricated by the use of thick film photoresist mandrels as substrates for electoforming or other deposition techniques. Novel methods have been developed for the sculpting of the resist to desired shapes. These techniques rely heavily on the use of glass or other substrates coated with layers of metal. The metal serves both as a photomask and as a conductor of electricity. Commercially available chrome-on-glass photomasks are convenient for this purpose although other substrates have also been used. By controlling the thickness and light transmission of the metal layer, the amount of exposure of the resist can also be controlled to produce the desired shapes in the resist. For even more complex mandrels the resist can be exposed from both sides using self-aligned photomasks.

Luminal surface fabrication for cardiovascular prostheses

NASA Technical Reports Server (NTRS)

Deininger, William D. (Inventor); Gabriel, Stephen B. (Inventor)

1988-01-01

A method is provided for forming a mold surface with microscopic upstanding pillars for molding the inside surface of a vascular prostheses (synthetic blood vessel). The mold article is formed from a quantity of Teflon (polytetrafluoroethylene) which has a polished, flat surface on which a gold film has been sputter deposited. A photoresist layer, which cannot adhere directly to Teflon, adheres to the gold. The photoresist is exposed and developed leaving a sputter resistant mask defining the desired pillar locations, and the resulting workpiece is ion etched to form the pillars in the Teflon. A synthetic blood vessel material is cast against the Teflon mold to form blind recesses on the inside of the synthetic blood vessel, with the recesses being of predetermined uniform cross section and present in a predetermined uniform pattern.

75 FR 70901 - Polyethylene Terephthalate Film, Sheet, and Strip From the Republic of Korea: Final Results of...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-11-19

... Film, Sheet, and Strip From the Republic of Korea: Final Results of Antidumping Duty Administrative... administrative review of the antidumping order on polyethylene terephthalate film, sheet and strip (PET film) from the Republic of Korea (Korea). See Polyethylene Terephthalate Film, Sheet, and Strip from the...

77 FR 14501 - Polyethylene Terephthalate Film, Sheet and Strip From India: Extension of Time Limit for...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-03-12

... Film, Sheet and Strip From India: Extension of Time Limit for Preliminary Results of Antidumping Duty... review under the antidumping duty (AD) order on polyethylene terephthalate film, sheet and strip from... Polyethylene Terephthalate Film, Sheet and Strip From India: Rescission, In Part, of Antidumping Duty...

Review of Polyimides Used in the Manufacturing of Micro Systems

NASA Technical Reports Server (NTRS)

Wilson, William C.; Atkinson, Gary M.

2007-01-01

Since their invention, polyimides have found numerous uses in MicroElectroMechanical Systems (MEMS) technology. Polyimides can act as photoresist, sacrificial layers, structural layers, and even as a replacement for silicon as the substrate during MEMS fabrication. They enable fabrication of both low and high aspect ratio devices. Polyimides have been used to fabricate expendable molds and reusable flexible molds. Development of a variety of devices that employ polyimides for sensor applications has occurred. Micro-robotic actuator applications include hinges, thermal actuators and residual stress actuators. Currently, polyimides are being used to create new sensors and devices for aerospace applications. This paper presents a review of some of the many uses of polyimides in the development of MEMS devices, including a new polyimide based MEMS fabrication process.

X-ray mask and method for providing same

DOEpatents

Morales, Alfredo M [Pleasanton, CA; Skala, Dawn M [Fremont, CA

2004-09-28

The present invention describes a method for fabricating an x-ray mask tool which can achieve pattern features having lateral dimension of less than 1 micron. The process uses a thin photoresist and a standard lithographic mask to transfer an trace image pattern in the surface of a silicon wafer by exposing and developing the resist. The exposed portion of the silicon substrate is then anisotropically etched to provide an etched image of the trace image pattern consisting of a series of channels in the silicon having a high depth-to-width aspect ratio. These channels are then filled by depositing a metal such as gold to provide an inverse image of the trace image and thereby providing a robust x-ray mask tool.

75 FR 69400 - Polyethylene Terephthalate Film, Sheet and Strip From India: Extension of Time Limit for...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-11-12

... Film, Sheet and Strip From India: Extension of Time Limit for Preliminary Results of Countervailing... countervailing duty order on polyethylene terephthalate film, sheet and strip from India for the period January 1, 2009, through December 31, 2009. See Polyethylene Terephthalate Film, Sheet and Strip from India...

78 FR 79400 - Polyethylene Terephthalate Film, Sheet, and Strip From the People's Republic of China: Initiation...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-12-30

... Film, Sheet, and Strip From the People's Republic of China: Initiation of Antidumping Duty New Shipper... order on polyethylene terephthalate film, sheet, and strip (``PET film'') from the People's Republic of... order on polyethylene terephthalate film, sheet, and strip from the PRC was published on November 10...

76 FR 18519 - Polyethylene Terephthalate Film, Sheet, and Strip From Taiwan: Amended Final Results of...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-04-04

... Film, Sheet, and Strip From Taiwan: Amended Final Results of Antidumping Duty Review AGENCY: Import... duty administrative review of polyethylene terephthalate film, sheet, and strip (PET Film) from Taiwan... amended (the Act). \\1\\ See Polyethylene Terephthalate Film, Sheet, and Strip From Taiwan: Final Results of...

76 FR 30908 - Polyethylene Terephthalate Film, Sheet, and Strip From India: Final Results of Antidumping Duty...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-05-27

... Film, Sheet, and Strip From India: Final Results of Antidumping Duty New Shipper Review AGENCY: Import... polyethylene terephthalate film, sheet and strip (PET Film) from India for SRF Limited (SRF), covering the... Polyethylene Terephthalate Film, Sheet, and Strip From India: Preliminary Results of Antidumping Duty New...

Method for maintaining precise suction strip porosities

NASA Technical Reports Server (NTRS)

Gallimore, Frank H. (Inventor)

1989-01-01

This invention relates to a masking method generally and, more particularly to a method of masking perforated titanium sheets having laminar control suction strips. As illustrated in the drawings, a nonaerodynamic surface of a perforated sheet has alternating suction strip areas and bonding land areas. Suction strip tapes overlie the bonding land areas during application of a masking material to an upper surface of the suction strip tapes. Prior to bonding the perforated sheet to a composite structure, the bonding land tapes are removed. The entire opposite aerodynamic surface is masked with tape before bonding. This invention provides a precise control of suction strip porosities by ensuring that no chemicals penetrate the suction strip areas during bonding.

X-ray mask and method for providing same

DOEpatents

Morales, Alfredo M.; Skala, Dawn M.

2002-01-01

The present invention describes a method for fabricating an x-ray mask tool which can achieve pattern features having lateral dimension of less than 1 micron. The process uses a thin photoresist and a standard lithographic mask to transfer an trace image pattern in the surface of a silicon wafer by exposing and developing the resist. The exposed portion of the silicon substrate is then anisotropically etched to provide an etched image of the trace image pattern consisting of a series of channels in the silicon having a high depth-to-width aspect ratio. These channels are then filled by depositing a metal such as gold to provide an inverse image of the trace image and thereby providing a robust x-ray mask tool.

The Dark Side of the Moebius Strip.

ERIC Educational Resources Information Center

Schwarz, Gideon E.

1990-01-01

Discussed are various models proposed for the Moebius strip. Included are a discussion of a smooth flat model and two smooth flat algebraic models, some results concerning the shortest Moebius strip, the Moebius strip of least elastic energy, and some observations on real-world Moebius strips. (KR)

Effects of certain key metrics of hydroentanglement system on properties of nonwoven fabrics made with commercially cleaned greige cotton

USDA-ARS?s Scientific Manuscript database

Research was conducted to determine the effects of certain key process metrics of a commercial-grade hydroentanglement system on properties of the nonwoven fabrics made with cleaned Upland greige cotton lint. The metrics studied, among others, were the hydroentangling water pressure, the strip orif...

Magnetoelastic Effect-Based Transmissive Stress Detection for Steel Strips: Theory and Experiment

PubMed Central

Zhang, Qingdong; Su, Yuanxiao; Zhang, Liyuan; Bi, Jia; Luo, Jiang

2016-01-01

For the deficiencies of traditional stress detection methods for steel strips in industrial production, this paper proposes a non-contact stress detection scheme based on the magnetoelastic effect. The theoretical model of the transmission-type stress detection is established, in which the output voltage and the tested stress obey a linear relation. Then, a stress detection device is built for the experiment, and Q235 steel under uniaxial tension is tested as an example. The result shows that the output voltage rises linearly with the increase of the tensile stress, consistent with the theoretical prediction. To ensure the accuracy of the stress detection method in actual application, the temperature compensation, magnetic shielding and some other key technologies are investigated to reduce the interference of the external factors, such as environment temperature and surrounding magnetic field. The present research develops the theoretical and experimental foundations for the magnetic stress detection system, which can be used for online non-contact monitoring of strip flatness-related stress (tension distribution or longitudinal residual stress) in the steel strip rolling process, the quality evaluation of strip flatness after rolling, the life and safety assessment of metal construction and other industrial production links. PMID:27589742

Occultation Predictions Using CCD Strip-Scanning Astrometry

NASA Technical Reports Server (NTRS)

Dunham, Edward W.; Ford, C. H.; Stone, R. P. S.; McDonald, S. W.; Olkin, C. B.; Elliot, J. L.; Witteborn, Fred C. (Technical Monitor)

1994-01-01

We are developing the method of CCD strip-scanning astrometry for the purpose of deriving reliable advance predictions for occultations involving small objects in the outer solar system. We are using a camera system based on a Ford/Loral 2Kx2K CCD with the Crossley telescope at Lick Observatory for this work. The columns of die CCD are aligned East-West, the telescope drive is stopped, and the CCD is clocked at the same rate that the stars drift across it. In this way we obtain arbitrary length strip images 20 arcmin wide with 0.58" pixels. Since planets move mainly in RA, it is possible to obtain images of the planet and star to be occulted on the same strip well before the occultation occurs. The strip-to-strip precision (i.e. reproducibility) of positions is limited by atmospheric image motion to about 0.1" rms per strip. However, for objects that are nearby in R.A., the image motion is highly correlated and their relative positions are good to 0.02" rms per strip. We will show that the effects of atmospheric image motion on a given strip can be removed if a sufficient number of strips of a given area have been obtained. Thus, it is possible to reach an rms precision of 0.02" per strip, corresponding to about 0.3 of Pluto or Triton's angular radius. The ultimate accuracy of a prediction based on strip-scanning astrometry is currently limited by the accuracy of the positions of the stars in the astrometric network used and by systematic errors most likely due to the optical system. We will show the results of . the prediction of some recent occultations as examples of the current capabilities and limitations of this technique.

76 FR 71512 - Polyethylene Terephthalate Film, Sheet, and Strip From Korea: Final Results of Antidumping Duty...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-11-18

... Film, Sheet, and Strip From Korea: Final Results of Antidumping Duty Administrative Review and... terephthalate film, sheet, and strip (PET film) from Korea, covering the June 1, 2009, to May 31, 2010, period of review (POR).\\1\\ \\1\\ See Polyethylene Terephthalate Film, Sheet, and Strip from the Republic of...

75 FR 81308 - Stainless Steel Sheet And Strip From Germany, Italy, Japan, Korea, Mexico, And Taiwan

Federal Register 2010, 2011, 2012, 2013, 2014

2010-12-27

...)] Stainless Steel Sheet And Strip From Germany, Italy, Japan, Korea, Mexico, And Taiwan AGENCY: United States... and strip from Germany, Italy, Japan, Korea, Mexico, and Taiwan. SUMMARY: The Commission hereby gives... strip from Germany, Italy, Japan, Korea, Mexico, and Taiwan would be likely to lead to continuation or...

Freestanding membrane composed of micro-ring array with ultrahigh sidewall aspect ratio for application in lightweight cathode arrays

NASA Astrophysics Data System (ADS)

Wang, Lanlan; Liu, Hongzhong; Jiang, Weitao; Gao, Wei; Chen, Bangdao; Li, Xin; Ding, Yucheng; An, Ningli

2014-12-01

A freestanding multilayer ultrathin nano-membrane (FUN-membrane) with a micro-ring array (MRA) is successfully fabricated through the controllable film deposition. Each micro-ring of FUN-membrane is 3 μm in diameter, 2 μm in height and sub-100 nm in sidewall thickness, demonstrating an ultrahigh sidewall aspect ratio of 20:1. In our strategy, a silica layer (200 nm in thickness), a chromium transition layer (5 nm-thick) and a gold layer (40 nm-thick), were in sequence deposited on patterned photoresist. After removal of the photoresist by lift-off process, a FUN-membrane with MRA was peeled off from the substrate, where the gold layer acted as a protecting layer to prevent the MRA from fracture. The FUN-membrane was then transferred to a flexible polycarbonate (PC) sheet coated with indium tin oxide (ITO) layer, which was then used as a flexible and lightweight cathode. Remarkably, the field emission effect of the fabricated FUN-membrane cathode performs a high field-enhancement factor of 1.2 × 104 and a low turn-on voltage of 2 V/μm, indicating the advantages of the sharp metal edge of MRA. Due to the rational design and material versatility, the FUN-membrane thus could be transferred to either rigid or flexible substrate, even curved surface, such as the skin of bio-robot's arm or leg. Additionally, the FUN-membrane composed of MRA with extremely high aspect ratio of insulator-metal sidewall, also provides potential applications in optical devices, lightweight and flexible display devices, and electronic eye imagers.

76 FR 12937 - Polyethylene Terephthalate Film, Sheet and Strip From India: Extension of Time Limit for Final...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-03-09

... Film, Sheet and Strip From India: Extension of Time Limit for Final Results of Antidumping Duty New... terephthalate film, sheet and strip from India for SRF Limited (SRF) covering the period July 1, 2009, through December 31, 2009. See Polyethylene Terephthalate Film, Sheet and Strip from India: Preliminary Results of...

75 FR 59744 - Stainless Steel Sheet and Strip From Germany, Italy, Japan, Korea, Mexico, and Taiwan

Federal Register 2010, 2011, 2012, 2013, 2014

2010-09-28

...)] Stainless Steel Sheet and Strip From Germany, Italy, Japan, Korea, Mexico, and Taiwan AGENCY: United States... duty orders on stainless steel sheet and strip from Germany, Italy, Japan, Korea, Mexico, and Taiwan... stainless steel sheet and strip from Germany, Italy, Japan, Korea, Mexico, and Taiwan would be likely to...

76 FR 12938 - Polyethylene Terephthalate Film, Sheet and Strip From India: Extension of Time Limit for Final...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-03-09

... Film, Sheet and Strip From India: Extension of Time Limit for Final Results of Countervailing Duty New... terephthalate film, sheet and strip from India for SRF Limited (SRF), covering the period January 1, 2009, through December 31, 2009. See Polyethylene Terephthalate Film, Sheet, and Strip From India: Preliminary...

76 FR 46323 - Stainless Steel Sheet and Strip From Germany, Italy, Japan, Korea, Mexico, and Taiwan

Federal Register 2010, 2011, 2012, 2013, 2014

2011-08-02

...)] Stainless Steel Sheet and Strip From Germany, Italy, Japan, Korea, Mexico, and Taiwan Determination On the... antidumping duty orders on stainless steel sheet and strip from Japan, Korea, and Taiwan \\3\\ would be likely... Commissioner Daniel R. Pearson dissenting with respect to stainless steel sheet and strip from Japan, Korea...

Biorecognition by DNA oligonucleotides after Exposure to Photoresists and Resist Removers

PubMed Central

Dean, Stacey L.; Morrow, Thomas J.; Patrick, Sue; Li, Mingwei; Clawson, Gary; Mayer, Theresa S.; Keating, Christine D.

2013-01-01

Combining biological molecules with integrated circuit technology is of considerable interest for next generation sensors and biomedical devices. Current lithographic microfabrication methods, however, were developed for compatibility with silicon technology rather than bioorganic molecules and consequently it cannot be assumed that biomolecules will remain attached and intact during on-chip processing. Here, we evaluate the effects of three common photoresists (Microposit S1800 series, PMGI SF6, and Megaposit SPR 3012) and two photoresist removers (acetone and 1165 remover) on the ability of surface-immobilized DNA oligonucleotides to selectively recognize their reverse-complementary sequence. Two common DNA immobilization methods were compared: adsorption of 5′-thiolated sequences directly to gold nanowires and covalent attachment of 5′-thiolated sequences to surface amines on silica coated nanowires. We found that acetone had deleterious effects on selective hybridization as compared to 1165 remover, presumably due to incomplete resist removal. Use of the PMGI photoresist, which involves a high temperature bake step, was detrimental to the later performance of nanowire-bound DNA in hybridization assays, especially for DNA attached via thiol adsorption. The other three photoresists did not substantially degrade DNA binding capacity or selectivity for complementary DNA sequences. To determine if the lithographic steps caused more subtle damage, we also tested oligonucleotides containing a single base mismatch. Finally, a two-step photolithographic process was developed and used in combination with dielectrophoretic nanowire assembly to produce an array of doubly-contacted, electrically isolated individual nanowire components on a chip. Post-fabrication fluorescence imaging indicated that nanowire-bound DNA was present and able to selectively bind complementary strands. PMID:23952639

Fabrication of ordered metallic glass nanotube arrays for label-free biosensing with diffractive reflectance.

PubMed

Chen, Wei-Ting; Li, Shao-Sian; Chu, Jinn P; Feng, Kuei Chih; Chen, Jem-Kun

2018-04-15

In this study, a photoresist template with well-defined contact hole array was fabricated, to which radio frequency magnetron sputtering process was then applied to deposit an alloyed Zr 55 Cu 30 Al 10 Ni 5 target, and finally resulted in ordered metallic glass nanotube (MGNT) arrays after removal of the photoresist template. The thickness of the MGNT walls increased from 98 to 126nm upon increasing the deposition time from 225 to 675s. The wall thickness of the MGNT arrays also increased while the dimensions of MGNT reduced under the same deposition condition. The MGNT could be filled with biomacromolecules to change the effective refractive index. The air fraction of the medium layer were evaluated through static water contact angle measurements and, thereby, the effective refractive indices the transverse magnetic (TM) and transverse electric (TE) polarized modes were calculated. A standard biotin-streptavidin affinity model was tested using the MGNT arrays and the fundamental response of the system was investigated. Results show that filling the MGNT with streptavidin altered the effective refractive index of the layer, the angle of reflectance and color changes identified by an L*a*b* color space and color circle on an a*b* chromaticity diagram. The limit of detection (LOD) of the MGNT arrays for detection of streptavidin was estimated as 25nM, with a detection time of 10min. Thus, the MGNT arrays may be used as a versatile platform for high-sensitive label-free optical biosensing. Copyright © 2017 Elsevier B.V. All rights reserved.

Photoresist composition for extreme ultraviolet lithography

DOEpatents

Felter, T. E.; Kubiak, G. D.

1999-01-01

A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

Integrated structure vacuum tube

NASA Technical Reports Server (NTRS)

Dimeff, J.; Kerwin, W. J. (Inventor)

1976-01-01

High efficiency, multi-dimensional thin film vacuum tubes suitable for use in high temperature, high radiation environments are described. The tubes are fabricated by placing thin film electrode members in selected arrays on facing interior wall surfaces of an alumina substrate envelope. Cathode members are formed using thin films of triple carbonate. The photoresist used in photolithography aids in activation of the cathodes by carbonizing and reacting with the reduced carbonates when heated in vacuum during forming. The finely powdered triple carbonate is mixed with the photoresist used to delineate the cathode locations in the conventional solid state photolithographic manner. Anode and grid members are formed using thin films of refractory metal. Electron flow in the tubes is between grid elements from cathode to anode as in a conventional three-dimensional tube.

Method for providing an arbitrary three-dimensional microstructure in silicon using an anisotropic deep etch

DOEpatents

Morales, Alfredo M.; Gonzales, Marcela

2004-06-15

The present invention describes a method for fabricating an embossing tool or an x-ray mask tool, providing microstructures that smoothly vary in height from point-to-point in etched substrates, i.e., structure which can vary in all three dimensions. The process uses a lithographic technique to transfer an image pattern in the surface of a silicon wafer by exposing and developing the resist and then etching the silicon substrate. Importantly, the photoresist is variably exposed so that when developed some of the resist layer remains. The remaining undeveloped resist acts as an etchant barrier to the reactive plasma used to etch the silicon substrate and therefore provides the ability etch structures of variable depths.

Strip casting apparatus and method

DOEpatents

Williams, R.S.; Baker, D.F.

1988-09-20

Strip casting apparatus including a molten-metal-holding container and a nozzle to deposit molten metal onto a moving chill drum to directly cast continuous metallic strip. The nozzle body includes a slot bounded between a back and a front lip. The slot width exceeds about 20 times the gap distance between the nozzle and the chill drum surface. Preferably, the slot width exceeds 0.5 inch. This method of strip casting minimizes pressure drop, insuring better metal-to-chill-drum contact which promotes heat transfer and results in a better quality metallic strip. 6 figs.

Strip casting apparatus and method

DOEpatents

Williams, Robert S.; Baker, Donald F.

1988-01-01

Strip casting apparatus including a molten-metal-holding container and a nozzle to deposit molten metal onto a moving chill drum to directly cast continuous metallic strip. The nozzle body includes a slot bounded between a back and a front lip. The slot width exceeds about 20 times the gap distance between the nozzle and the chill drum surface. Preferably, the slot width exceeds 0.5 inch. This method of strip casting minimizes pressure drop, insuring better metal-to-chill-drum contact which promotes heat transfer and results in a better quality metallic strip.

76 FR 58299 - Brass Sheet and Strip From France, Germany, Italy, and Japan; Scheduling of a Full Five-Year...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-09-20

...)] Brass Sheet and Strip From France, Germany, Italy, and Japan; Scheduling of a Full Five-Year Review Concerning the Antidumping Duty Order on Brass Sheet and Strip From France, Germany, Italy, and Japan AGENCY... strip from France, Germany, Italy, and Japan would be likely to lead to continuation or recurrence of...

78 FR 14270 - Stainless Steel Sheet and Strip in Coils From Mexico: Notice of Settlement of NAFTA Proceedings

Federal Register 2010, 2011, 2012, 2013, 2014

2013-03-05

... DEPARTMENT OF COMMERCE International Trade Administration [A-201-822] Stainless Steel Sheet and... stainless steel sheet and strip in coils from Mexico (SSSS from Mexico). See Stainless Steel Sheet and Strip..., 2010, as a result of a sunset review. See Stainless Steel Sheet and Strip in Coils from Germany, Italy...

Flexible Faraday Cage with a Twist: Surface Charge on a Mobius Strip

ERIC Educational Resources Information Center

Stewart, Sean

2007-01-01

Once an intriguing topological novelty known only to mathematicians, the Mobius strip has become a source of fascination and inspiration to the layperson and artist alike. Principal among its features are the two strange properties that the Mobius strip is a surface with only one side and one edge. A Mobius strip is readily formed by taking a long…

Lithographically Patterned Nanoscale Electrodeposition of Plasmonic, Bimetallic, Semiconductor, Magnetic, and Polymer Nanoring Arrays

PubMed Central

2015-01-01

Large area arrays of magnetic, semiconducting, and insulating nanorings were created by coupling colloidal lithography with nanoscale electrodeposition. This versatile nanoscale fabrication process allows for the independent tuning of the spacing, diameter, and width of the nanorings with typical values of 1.0 μm, 750 nm, and 100 nm, respectively, and was used to form nanorings from a host of materials: Ni, Co, bimetallic Ni/Au, CdSe, and polydopamine. These nanoring arrays have potential applications in memory storage, optical materials, and biosensing. A modified version of this nanoscale electrodeposition process was also used to create arrays of split gold nanorings. The size of the split nanoring opening was controlled by the angle of photoresist exposure during the fabrication process and could be varied from 50% down to 10% of the ring circumference. The large area (cm2 scale) gold split nanoring array surfaces exhibited strong polarization-dependent plasmonic absorption bands for wavelengths from 1 to 5 μm. Plasmonic nanoscale split ring arrays are potentially useful as tunable dichroic materials throughout the infrared and near-infrared spectral regions. PMID:25553204

Free-floating magnetic microstructures by mask photolithography

NASA Astrophysics Data System (ADS)

Huong Au, Thi; Thien Trinh, Duc; Bich Do, Danh; Phu Nguyen, Dang; Cong Tong, Quang; Diep Lai, Ngoc

2018-03-01

This work explores the fabrication of free-floating magnetic structures on a photocurable nanocomposite consisting of superparamagnetic magnetite nanoparticles (Fe3O4) and a commercial SU-8 negative tone photoresist. The nanocomposite was synthesized by mixing magnetic nanoparticles with different kinds of SU-8 resin. We demonstrated that the dispersion of Fe3O4 nanoparticles in nanocomposite solution strongly depended on the particles concentration, the viscosity of SU-8 polymer, and the mixing time. The influence of these factors was demonstrated by examining the structures fabricated by mask photolithography technique. We obtained the best quality of structures at a low concentration, below 5 wt%, of Fe3O4 nanoparticles in SU-8 2005 photoresist for a mixing time of about 20 days. The manipulation of free-floating magnetic microstructures by an external magnetic field was also demonstrated showing promising applications of this magnetic nanocomposite.

Method of constructing dished ion thruster grids to provide hole array spacing compensation

NASA Technical Reports Server (NTRS)

Banks, B. A. (Inventor)

1976-01-01

The center-to-center spacings of a photoresist pattern for an array of holes applied to a thin metal sheet are increased by uniformly stretching the thin metal sheet in all directions along the plane of the sheet. The uniform stretching is provided by securely clamping the periphery of the sheet and applying an annular force against the face of the sheet, within the periphery of the sheet and around the photoresist pattern. The technique is used in the construction of ion thruster grid units where the outer or downstream grid is subjected to uniform stretching prior to convex molding. The technique provides alignment of the holes of grid pairs so as to direct the ion beamlets in a direction parallel to the axis of the grid unit and thereby provide optimization of the available thrust.

75 FR 14423 - Polyethylene Terephthalate Film, Sheet and Strip from Taiwan: Extension of Time Limit for...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-03-25

... Film, Sheet and Strip from Taiwan: Extension of Time Limit for Preliminary Results of Antidumping Duty... the antidumping duty order on polyethylene terephthalate film, sheet and strip from Taiwan for the... antidumping order on polyethylene terephthalate film, sheet and strip from Taiwan was for the period of...

75 FR 65450 - Polyethylene Terephthalate Film, Sheet and Strip From India: Extension of Time Limit for...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-10-25

... Film, Sheet and Strip From India: Extension of Time Limit for Preliminary Results of Antidumping Duty... polyethylene terephthalate film, sheet and strip from India for the period July 1, 2009 through December 31, 2009. See Polyethylene Terephthalate Film, Sheet and Strip from India: Initiation of Antidumping Duty...

78 FR 35245 - Polyethylene Terephthalate Film, Sheet, and Strip From the People's Republic of China: Final...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-06-12

... Film, Sheet, and Strip From the People's Republic of China: Final Results of Antidumping Duty... polyethylene terephthalate film, sheet, and strip (``PET film'') from the People's Republic of China (``PRC..., 2011. \\1\\ See Polyethylene Terephthalate Film, Sheet, and Strip From the People's Republic of China...

A novel fabrication method for suspended high-aspect-ratio microstructures

NASA Astrophysics Data System (ADS)

Yang, Yao-Joe; Kuo, Wen-Cheng

2005-11-01

Suspended high-aspect-ratio structures (suspended HARS) are widely used for MEMS devices such as micro-gyroscopes, micro-accelerometers, optical switches and so on. Various fabrication methods, such as SOI, SCREAM, AIM, SBM and BELST processes, were proposed to fabricate HARS. However, these methods focus on the fabrication of suspended microstructures with relatively small widths of trench opening (e.g. less than 10 µm). In this paper, we propose a novel process for fabricating very high-aspect-ratio suspended structures with large widths of trench opening using photoresist as an etching mask. By enhancing the microtrenching effect, we can easily release the suspended structure without thoroughly removing the floor polymer inside the trenches for the cases with a relatively small trench aspect ratio. All the process steps can be integrated into a single-run single-mask ICP-RIE process, which effectively reduces the process complexity and fabrication cost. We also discuss the phenomenon of corner erosion, which results in the undesired etching of silicon structures during the structure-releasing step. By using the proposed process, 100 µm thick suspended structures with the trench aspect ratio of about 20 are demonstrated. Also, the proposed process can be used to fabricate devices for applications which require large in-plane displacement. This paper was orally presented in the Transducers'05, Seoul, Korea (paper ID: 3B1.3).

The water crisis in the gaza strip: prospects for resolution.

PubMed

Weinthal, E; Vengosh, A; Marei, A; Kloppmann, W

2005-01-01

Israel and the Palestinian Authority share the southern Mediterranean coastal aquifer. Long-term overexploitation in the Gaza Strip has resulted in a decreasing water table, accompanied by the degradation of its water quality. Due to high levels of salinity and nitrate and boron pollution, most of the ground water is inadequate for both domestic and agricultural consumption. The rapid rate of population growth in the Gaza Strip and dependence upon ground water as a single water source present a serious challenge for future political stability and economic development. Here, we integrate the results of geochemical studies and numerical modeling to postulate different management scenarios for joint management between Israel and the Palestinian Authority. The chemical and isotopic data show that most of the salinity phenomena in the Gaza Strip are derived from the natural flow of saline ground water from Israel toward the Gaza Strip. As a result, the southern coastal aquifer does not resemble a classic "upstream-downstream" dispute because Israel's pumping of the saline ground water reduces the salinization rates of ground water in the Gaza Strip. Simulation of different pumping scenarios using a monolayer, hydrodynamic, two-dimensional model (MARTHE) confirms the hypothesis that increasing pumping along the Gaza Strip border combined with a moderate reduction of pumping within the Gaza Strip would improve ground water quality within the Gaza Strip. We find that pumping the saline ground water for a source of reverse-osmosis desalination and then supplying the desalinated water to the Gaza Strip should be an essential component of a future joint management strategy between Israel and the Palestinian Authority.

Single-Axis Accelerometer

NASA Technical Reports Server (NTRS)

Tucker, Dennis Stephen (Inventor); Capo-Lugo, Pedro A. (Inventor)

2016-01-01

A single-axis accelerometer includes a housing defining a sleeve. An object/mass is disposed in the sleeve for sliding movement therein in a direction aligned with the sleeve's longitudinal axis. A first piezoelectric strip, attached to a first side of the object and to the housing, is longitudinally aligned with the sleeve's longitudinal axis. The first piezoelectric strip includes a first strip of a piezoelectric material with carbon nanotubes substantially aligned along a length thereof. A second piezoelectric strip, attached to a second side of the object and to the housing, is longitudinally aligned with the sleeve's longitudinal axis. The second piezoelectric strip includes a second strip of the piezoelectric material with carbon nanotubes substantially aligned along a length thereof. A voltage sensor is electrically coupled to at least one of the first and second piezoelectric strips.

The pea stem

PubMed Central

Karahara, Ichirou

2012-01-01

The Casparian strip is commonly observed in the endodermis of roots of vascular plants and, in some cases, also in the stems. Pea stems develop the Casparian strip, and its development has been reported to be regulated by blue light. In addition, for the purpose of photobiological studies, pea stems provide a unique experimental system for other physiological studies of the development of the Casparian strip. In this article, I have briefly summarized (1) the effects of environmental factors on the development of the Casparian strip, (2) the advantage of using pea stems for physiological studies of the development of the Casparian strip, and (3) cellular events indicated to be involved in the development of the Casparian strip, focusing on the studies using pea stems as well as other recent studies. PMID:22899074

Effects of fatigue and environment on residual strengths of center-cracked graphite/epoxy buffer strip panels

NASA Technical Reports Server (NTRS)

Bigelow, Catherine A.

1989-01-01

The effects of fatigue, moisture conditioning, and heating on the residual tension strengths of center-cracked graphite/epoxy buffer strip panels were evaluated using specimens made with T300/5208 graphite epoxy in a 16-ply quasi-isotropic layup, with two different buffer strip materials, Kevlar-49 or S-glass. It was found that, for panels subjected to fatigue loading, the residual strengths were not significantly affected by the fatigue loading, the number of repetitions of the loading spectrum, or the maximum strain level. The moisture conditioning reduced the residual strengths of the S-glass buffer strip panels by 10 to 15 percent below the ambient results, but increased the residual strengths of the Kevlar-49 buffer strip panels slightly. For both buffer strip materials, the heat increased the residual strengths of the buffer strip panels slightly over the ambient results.

Rapid Prototyping of Nanofluidic Slits in a Silicone Bilayer

PubMed Central

Kole, Thomas P.; Liao, Kuo-Tang; Schiffels, Daniel; Ilic, B. Robert; Strychalski, Elizabeth A.; Kralj, Jason G.; Liddle, J. Alexander; Dritschilo, Anatoly; Stavis, Samuel M.

2015-01-01

This article reports a process for rapidly prototyping nanofluidic devices, particularly those comprising slits with microscale widths and nanoscale depths, in silicone. This process consists of designing a nanofluidic device, fabricating a photomask, fabricating a device mold in epoxy photoresist, molding a device in silicone, cutting and punching a molded silicone device, bonding a silicone device to a glass substrate, and filling the device with aqueous solution. By using a bilayer of hard and soft silicone, we have formed and filled nanofluidic slits with depths of less than 400 nm and aspect ratios of width to depth exceeding 250 without collapse of the slits. An important attribute of this article is that the description of this rapid prototyping process is very comprehensive, presenting context and details which are highly relevant to the rational implementation and reliable repetition of the process. Moreover, this process makes use of equipment commonly found in nanofabrication facilities and research laboratories, facilitating the broad adaptation and application of the process. Therefore, while this article specifically informs users of the Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST), we anticipate that this information will be generally useful for the nanofabrication and nanofluidics research communities at large, and particularly useful for neophyte nanofabricators and nanofluidicists. PMID:26958449

Low dose radiation damage effects in silicon strip detectors

NASA Astrophysics Data System (ADS)

Wiącek, P.; Dąbrowski, W.

2016-11-01

The radiation damage effects in silicon segmented detectors caused by X-rays have become recently an important research topic driven mainly by development of new detectors for applications at the European X-ray Free Electron Laser (E-XFEL). However, radiation damage in silicon strip is observed not only after extreme doses up to 1 GGy expected at E-XFEL, but also at doses in the range of tens of Gy, to which the detectors in laboratory instruments like X-ray diffractometers or X-ray spectrometers can be exposed. In this paper we report on investigation of radiation damage effects in a custom developed silicon strip detector used in laboratory diffractometers equipped with X-ray tubes. Our results show that significant degradation of detector performance occurs at low doses, well below 200 Gy, which can be reached during normal operation of laboratory instruments. Degradation of the detector energy resolution can be explained by increasing leakage current and increasing interstrip capacitance of the sensor. Another observed effect caused by accumulation of charge trapped in the surface oxide layer is change of charge division between adjacent strips. In addition, we have observed unexpected anomalies in the annealing process.

Novel WSi/Au T-shaped gate GaAs metal-semiconductor field-effect-transistor fabrication process for super low-noise microwave monolithic integrated circuit amplifiers

DOE Office of Scientific and Technical Information (OSTI.GOV)

Takano, H.; Hosogi, K.; Kato, T.

1995-05-01

A fully ion-implanted self-aligned T-shaped gate Ga As metal-semiconductor field-effect transistor (MESFET) with high frequency and extremely low-noise performance has been successfully fabricated for super low-noise microwave monolithic integrated circuit (MMIC) amplifiers. A subhalf-micrometer gate structure composed of WSi/Ti/Mo/Au is employed to reduce gate resistance effectively. This multilayer gate structure is formed by newly developed dummy SiON self-alignment technology and a photoresist planarization process. At an operating frequency of 12 GHz, a minimum noise figure of 0.87 dB with an associated gain of 10.62 dB has been obtained. Based on the novel FET process, a low-noise single-stage MMIC amplifier withmore » an excellent low-noise figure of 1.2 dB with an associated gain of 8 dB in the 14 GHz band has been realized. This is the lowest noise figure ever reported at this frequency for low-noise MMICs based on ion-implanted self-aligned gate MESFET technology. 14 refs., 9 figs.« less

Range gated strip proximity sensor

DOEpatents

McEwan, Thomas E.

1996-01-01

A range gated strip proximity sensor uses one set of sensor electronics and a distributed antenna or strip which extends along the perimeter to be sensed. A micro-power RF transmitter is coupled to the first end of the strip and transmits a sequence of RF pulses on the strip to produce a sensor field along the strip. A receiver is coupled to the second end of the strip, and generates a field reference signal in response to the sequence of pulse on the line combined with received electromagnetic energy from reflections in the field. The sensor signals comprise pulses of radio frequency signals having a duration of less than 10 nanoseconds, and a pulse repetition rate on the order of 1 to 10 MegaHertz or less. The duration of the radio frequency pulses is adjusted to control the range of the sensor. An RF detector feeds a filter capacitor in response to received pulses on the strip line to produce a field reference signal representing the average amplitude of the received pulses. When a received pulse is mixed with a received echo, the mixing causes a fluctuation in the amplitude of the field reference signal, providing a range-limited Doppler type signature of a field disturbance.

Automatic Extraction of High-Resolution Rainfall Series from Rainfall Strip Charts

NASA Astrophysics Data System (ADS)

Saa-Requejo, Antonio; Valencia, Jose Luis; Garrido, Alberto; Tarquis, Ana M.

2015-04-01

Soil erosion is a complex phenomenon involving the detachment and transport of soil particles, storage and runoff of rainwater, and infiltration. The relative magnitude and importance of these processes depends on a host of factors, including climate, soil, topography, cropping and land management practices among others. Most models for soil erosion or hydrological processes need an accurate storm characterization. However, this data are not always available and in some cases indirect models are generated to fill this gap. In Spain, the rain intensity data known for time periods less than 24 hours back to 1924 and many studies are limited by it. In many cases this data is stored in rainfall strip charts in the meteorological stations but haven't been transfer in a numerical form. To overcome this deficiency in the raw data a process of information extraction from large amounts of rainfall strip charts is implemented by means of computer software. The method has been developed that largely automates the intensive-labour extraction work based on van Piggelen et al. (2011). The method consists of the following five basic steps: 1) scanning the charts to high-resolution digital images, 2) manually and visually registering relevant meta information from charts and pre-processing, 3) applying automatic curve extraction software in a batch process to determine the coordinates of cumulative rainfall lines on the images (main step), 4) post processing the curves that were not correctly determined in step 3, and 5) aggregating the cumulative rainfall in pixel coordinates to the desired time resolution. A colour detection procedure is introduced that automatically separates the background of the charts and rolls from the grid and subsequently the rainfall curve. The rainfall curve is detected by minimization of a cost function. Some utilities have been added to improve the previous work and automates some auxiliary processes: readjust the bands properly, merge bands when those have been scanned in two parts, detect and cut the borders of bands not used (demanded by the software). Also some variations in which colour system is tried basing in HUE or RGB colour have been included. Thanks to apply this digitization rainfall strip charts 209 station-years of three locations in the centre of Spain have been transformed to long-term rainfall time series with 5-min resolution. References van Piggelen, H.E., T. Brandsma, H. Manders, and J. F. Lichtenauer, 2011: Automatic Curve Extraction for Digitizing Rainfall Strip Charts. J. Atmos. Oceanic Technol., 28, 891-906. Acknowledgements Financial support for this research by DURERO Project (Env.C1.3913442) is greatly appreciated.

The lateral tarsal strip revisited. The enhanced tarsal strip.

PubMed

Jordan, D R; Anderson, R L

1989-04-01

The lateral tarsal strip procedure was originally designed for the treatment of upper and lower eyelid laxity, or lateral canthal tendon laxity or malposition. Despite the excellent results with a standard tarsal strip procedure for those eyelids with laxity and excess skin, we have encountered a number of patients with lower eyelid or canthal malpositions or both who would benefit from a tarsal strip, but who do not have lax tissues (especially skin), and may in fact have a shortage of skin. These include cases of lower lid retraction or canthal malposition following trauma, blepharoplasty, or other operations, and patients with tendency toward or having cicatricial ectropion. Any anterior lamella removal in such patients would aggravate the lid malposition and weaken the lateral canthal tissues to be sutured. We suggest a modification of the tarsal strip (developed by one of us [R.L.A.]) to treat many such patients without requiring additional anterior lamella (skin graft) or more formidable procedures. We refer to this technique as the "enhanced tarsal strip" technique, and we use this technique more frequently than the original tarsal strip procedure.

Curvature Control of Silicon Microlens for THz Dielectric Antenna

NASA Technical Reports Server (NTRS)

Lee, Choonsup; Chattopadhyay, Goutam; Cooper, Ken; Mehdi, Imran

2012-01-01

We have controlled the curvature of silicon microlens by changing the amount of photoresist in order to microfabricate hemispherical silicon microlens which can improve the directivity and reduce substrate mode losses.

FABRICATION OF A RETINAL PROSTHETIC TEST DEVICE USING ELECTRODEPOSITED SILICON OVER POLYPYRROLE PATTERNED WITH SU-8 PHOTORESIST

PubMed Central

Miller, Eric; Ellis, Daniel; Charles, Duran; McKenzie, Jason

2016-01-01

A materials fabrication study of a photodiode array for possible application of retina prosthesis was undertaken. A test device was fabricated using a glassy carbon electrode patterned with SU-8 photoresist. In the openings, p-type polypyrrole was first electrodeposited using 1-butyl-1-methylpyridinium bis(trifluoromethylsulfonyl)imide ionic liquid. The polypyrrole was self-doped with imide ion at ~1.5 mole %, was verified as p-type, and had a resistivity of ~20 Ωcm. N-type Silicon was then electrodeposited over this layer using silicon tetrachloride / phosphorus trichloride in acetonitrile and passivated in a second electrodeposition using trimethylchlorosilane. Electron microscopy revealed the successful electrodeposition of silicon over patterned polypyrrole. Rudimentary photodiode behavior was observed. The passivation improved but did not completely protect the electrodeposited silicon from oxidation by air. PMID:27616940

Chemically Accelerated Vibratory Surface Finishing (CAVSF)

DTIC Science & Technology

2009-02-01

media) • End-roughness and micro structure of different C- steels • Material removal and roughness changes versus the amount of treatment solution in...surface finishing (CAVSF) Visual appearance of strip steel test pieces during the CAVSF process. 0-120 minutes = acid treatment 120-135 minutes = water... steel during the super-finishing process 0 50 100 150 200 250 300 350 0 50 100 150 200 250 Time minutes R e m o v e d m a t e r i a l m i c r

Effect of Strip Mining on Water Quality in Small Streams in Eastern Kentucky, 1967-1975

Treesearch

Kenneth L. Dyer; Willie R. Curtis

1977-01-01

Eight years of streamflow data are analyzed to show the effects of strip mining on chemical quality of water in six first-order streams in Breathitt County, Kentucky. All these watersheds were unmined in August, 1967, but five have since been strip mined. The accumulated data from this case history study indicate that strip mining causes large increases in the...

77 FR 46687 - Polyethylene Terephthalate Film, Sheet, and Strip From India: Preliminary Results of Antidumping...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-08-06

.... Sales are made at different LOTs if they are made at different marketing stages (or their equivalent... determining that there is a difference in the stages of marketing.\\18\\ In order to determine whether the comparison market sales were at different stages in the marketing process than the U.S. sales, we reviewed...

77 FR 46704 - Polyethylene Terephthalate Film, Sheet, and Strip From Taiwan: Preliminary Results of Antidumping...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-08-06

... if they are made at different marketing stages (or their equivalent). See 19 CFR 351.412(c)(2... for determining that there is a difference in the stages of marketing.\\47\\ In order to determine whether the comparison market sales were at different stages in the marketing process than the U.S. sales...

Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists

DOE Office of Scientific and Technical Information (OSTI.GOV)

Pargon, E.; Menguelti, K.; Martin, M.

2009-05-01

In this article, we have performed detailed investigations of the 193 nm photoresist transformations after exposure to the so-called HBr and Ar plasma cure treatments using various characterization techniques (x-ray photoelectron spectroscopy, Fourier transformed infrared, Raman analyses, and ellipsometry). By using windows with different cutoff wavelengths patched on the photoresist film, the role of the plasma vacuum ultraviolet (VUV) light on the resist modifications is clearly outlined and distinguished from the role of radicals and ions from the plasma. The analyses reveal that both plasma cure treatments induce severe surface and bulk chemical modifications of the resist films. The synergisticmore » effects of low energetic ion bombardment and VUV plasma light lead to surface graphitization or cross-linking (on the order of 10 nm), while the plasma VUV light (110-210 nm) is clearly identified as being responsible for ester and lactone group removal from the resist bulk. As the resist modification depth depends strongly on the wavelength penetration into the material, it is found that HBr plasma cure that emits near 160-170 nm can chemically modify the photoresist through its entire thickness (240 nm), while the impact of Ar plasmas emitting near 100 nm is more limited. In the case of HBr cure treatment, Raman and ellipsometry analyses reveal the formation of sp{sup 2} carbon atoms in the resist bulk, certainly thanks to hydrogen diffusion through the resist film assisted by the VUV plasma light.« less

Strip-tillage: A conservation alternative to full-width tillage systems

NASA Astrophysics Data System (ADS)

Wolkowski, Richard

2015-04-01

Historically no-till management has been a challenge for maize production in the Midwestern USA because crop residue slows the warming of the soil in the spring and can physically impair planting by plugging the planter. After trying no-till, producers often return to more aggressive tillage operations to address residue concerns; however these systems can cause soil erosion and can increase the cost of production. An alternative system known as strip-tillage has been suggested as a compromise between no-till and full-width tillage. This practice utilizes implements that loosen the soil and allow warming in the row area, yet maintain nearly as much residue as no-till. Strip-tillage is generally understood to be a single pass with a separate implement in the fall, although spring strip-tillage is possible if soil moisture and conditions permit. Strip-tillage can be accomplished in a shorter time, with lower energy and equipment inputs compared to full-width tillage. The first of two studies that examined the merits of strip-tillage was conducted the University of Wisconsin Lancaster Agricultural Research Station (42.84, -90.80). Natural runoff collectors were installed in a field having a silt loam soil with an 8% slope in fall chisel and fall strip-tillage system. The measured soil loss in a year that experienced substantial rainfall prior to canopy closure was 10.6 Mg ha-1 in chisel vs. 0.64 Mg ha-1 in strip-tillage. Soil loss was much less for both systems in the second year when early season rainfall was minimal. A second, ten year study was conducted at the University of Wisconsin Arlington Agricultural Research Station (43.30, -89.36) that compared fall strip-tillage with fall chisel/spring field cultivator and no-till systems in both a continuous maize and soybean-maize rotation. This work showed equal maize grain yield in maize after soybean when comparing chisel and strip-tillage. No-till yield was about 5 % lower. Yield in continuous maize was highest in the chisel system, being about 4 % greater than strip-tillage and 8 % greater than no-till. An economic analysis of this data showed that the benefit to strip-tillage is greatest in maize following soybean. Strip-tillage is a system that can optimize both economic and environmental return for maize production and should be implemented more widely, especially on erosive soils.

Geometry and Mechanics in the Opening of Chiral Seed Pods

NASA Astrophysics Data System (ADS)

Armon, Shahaf; Efrati, Efi; Kupferman, Raz; Sharon, Eran

2011-09-01

We studied the mechanical process of seed pods opening in Bauhinia variegate and found a chirality-creating mechanism, which turns an initially flat pod valve into a helix. We studied configurations of strips cut from pod valve tissue and from composite elastic materials that mimic its structure. The experiments reveal various helical configurations with sharp morphological transitions between them. Using the mathematical framework of “incompatible elasticity,” we modeled the pod as a thin strip with a flat intrinsic metric and a saddle-like intrinsic curvature. Our theoretical analysis quantitatively predicts all observed configurations, thus linking the pod’s microscopic structure and macroscopic conformation. We suggest that this type of incompatible strip is likely to play a role in the self-assembly of chiral macromolecules and could be used for the engineering of synthetic self-shaping devices.

A packaged, low-cost, robust optical fiber strain sensor based on small cladding fiber sandwiched within periodic polymer grating.

PubMed

Chiang, Chia-Chin; Li, Chein-Hsing

2014-06-02

In the present study, a novel packaged long-period fiber grating (PLPFG) strain sensor is first presented. The MEMS process was utilized to fabricate the packaged optical fiber strain sensor. The sensor structure consisted of etched optical fiber sandwiched between two layers of thick photoresist SU-8 3050 and then packaged with poly (dimethylsiloxane) (PDMS) polymer material to construct the PLPFG strain sensor. The PDMS packaging material was used to prevent the glue effect, wherein glue flows into the LPFG structure and reduces coupling strength, in the surface bonding process. Because the fiber grating was packaged with PDMS material, it was effectively protected and made robust. The resonance attenuation dip of PLPFG grows when it is loading. This study explored the size effect of the grating period and fiber diameter of PLPFG via tensile testing. The experimental results found that the best strain sensitivity of the PLPFG strain sensor was -0.0342 dB/με, and that an R2 value of 0.963 was reached.

Microscale Patterning of Thermoplastic Polymer Surfaces by Selective Solvent Swelling

PubMed Central

Rahmanian, Omid; Chen, Chien-Fu; DeVoe, Don L.

2012-01-01

A new method for the fabrication of microscale features in thermoplastic substrates is presented. Unlike traditional thermoplastic microfabrication techniques, in which bulk polymer is displaced from the substrate by machining or embossing, a unique process termed orogenic microfabrication has been developed in which selected regions of a thermoplastic surface are raised from the substrate by an irreversible solvent swelling mechanism. The orogenic technique allows thermoplastic surfaces to be patterned using a variety of masking methods, resulting in three-dimensional features that would be difficult to achieve through traditional microfabrication methods. Using cyclic olefin copolymer as a model thermoplastic material, several variations of this process are described to realize growth heights ranging from several nanometers to tens of microns, with patterning techniques include direct photoresist masking, patterned UV/ozone surface passivation, elastomeric stamping, and noncontact spotting. Orogenic microfabrication is also demonstrated by direct inkjet printing as a facile photolithography-free masking method for rapid desktop thermoplastic microfabrication. PMID:22900539

An all solid-state, rolled strip pulse forming line with low impedance and compact structure

NASA Astrophysics Data System (ADS)

Yang, Shi; Zhong, Hui-Huang; Qian, Bao-Liang; Yang, Han-Wu

2010-04-01

An all solid-state and compact pulsed strip pulse forming line (PFL) is investigated both theoretically and experimentally. The electromagnetic field distribution and the pulse formation in the strip PFL are analyzed numerically. Based on the theoretical analysis and numerical results, a rolled strip PFL with output voltage of 20 kV, pulse duration of 230 ns, and characteristic impedance of 0.5 Ω was designed and manufactured. We use the Mylar film and copper as the dielectric and conductor of the strip PFL. The dimension of the strip line is 23 000×400×1.6 mm3 in the case in which the strip line is unrolled, and the strip line is finally rolled into a cylinder of diameter of 311 mm for the experiment. The dimension and weight are about ten times smaller than those of traditional dielectric (oil or pure water) PFL with the same electrical parameters. Two experiments were performed using the strip line. One was for a transmission line experiment, and the other was for a PFL experiment. In the experiment of transmission line, the transmission time of the voltage signal was 115 ns, and the signal had almost no distortion, which verified the design. In the PFL experiment, results gave a 17.8 kV, 270 ns (full width at half maximum) voltage pulse which was a quasisquare wave on the water load of 0.5 Ω. The current going through the load is about 35.6 kA.

The looped adhesive strip: An example of coplanar delamination interaction

NASA Technical Reports Server (NTRS)

Bottega, W. J.

1990-01-01

The phenomenon of peeling and debonding of thin layers is a subject of interest to those concerned with adhesives, thin films, and layered materials. In recent years much attention has been focused on such problems as a result of increased interest and application of advanced composites and thin film coatings. A related problem which is of interest for its own sake but also represents a simple example of a tangled adhesive strip and of coplanar delamination interaction, is the problem of a looped adhesive strip. This is the subject of the present study. Researchers consider here the problem of an elastic strip which possesses an adherend on (at least) one of its surfaces. If the strip is deformed so that two portions of such a surface are brought into contact, a position of the strip becomes bonded and a loop is formed. Researchers are interested in determining the equilibrium configuration of such a strip and investigating the behavior of the strip when its edges are pulled apart. The problem is approached as a moving interior boundary problem in the calculus of variations with the strip modeled as an inextensible elastica and the bond strength characterized by its surface energy. A Griffith type energy criterion is employed for debonding, and solutions corresponding to the problem of interest obtained. The solution obtained will be seen to predict the interesting phenomenon of bond point propagation, as well as the more standard peeling type behavior. Numerical results demonstrating the phenomena of interest are presented as well and will be seen to reveal both stable and unstable propagation of the boundaries of the bonded portion of the strip, depending upon the loading conditions.

Characterization of X3 Silicon Detectors for the ELISSA Array at ELI-NP

NASA Astrophysics Data System (ADS)

Chesnevskaya, S.; Balabanski, D. L.; Choudhury, D.; Cognata, M. La; Constantin, P.; Filipescu, D. M.; Ghita, D. G.; Guardo, G. L.; Lattuada, D.; Matei, C.; Rotaru, A.; Spitaleri, C.; State, A.; Xu, Y.

2018-01-01

Position-sensitive silicon strip detectors represent one of the best solutions for the detection of charged particles as they provide good energy and position resolution over a large range of energies. A silicon array coupled with the gamma beams at the ELI-NP facility would allow measuring photodissociation reactions of interest for Big Bang Nucleosynthesis and on heavy nuclei intervening in the p-process. Forty X3 detectors for our ELISSA (ELI-NP Silicon Strip Detectors Array) project have been recently purchased and tested. We investigated several specifications, such as leakage currents, depletion voltage, and detector stability under vacuum. The energy and position resolution, and ballistic deficit were measured and analyzed. This paper presents the main results of our extensive testing. The measured energy resolution for the X3 detectors is better than results published for similar arrays (ANASEN or ORRUBA).

LEO high voltage solar array arcing response model, continuation 5

NASA Technical Reports Server (NTRS)

Metz, Roger N.

1989-01-01

The modeling of the Debye Approximation electron sheaths in the edge and strip geometries was completed. Electrostatic potentials in these sheaths were compared to NASCAP/LEO solutions for similar geometries. Velocity fields, charge densities and particle fluxes to the biased surfaces were calculated for all cases. The major conclusion to be drawn from the comparisons of our Debye Approximation calculations with NASCAP-LEO output is that, where comparable biased structures can be defined and sufficient resolution obtained, these results are in general agreement. Numerical models for the Child-Langmuir, high-voltage electron sheaths in the edge and strip geometries were constructed. Electrostatic potentials were calculated for several cases in each of both geometries. Velocity fields and particle fluxes were calculated. The self-consistent solution process was carried through one cycle and output electrostatic potentials compared to NASCAP-type input potentials.

Flutter suppression and gust alleviation using active controls

NASA Technical Reports Server (NTRS)

Nissim, E.

1975-01-01

Application of the aerodynamic energy approach to some problems of flutter suppression and gust alleviation were considered. A simple modification of the control-law is suggested for achieving the required pitch control in the use of a leading edge - trailing edge activated strip. The possible replacement of the leading edge - trailing edge activated strip by a trailing edge - tab strip is also considered as an alternate solution. Parameters affecting the performance of the activated leading edge - trailing edge strip were tested on the Arava STOL Transport and the Westwind Executive Jet Transport and include strip location, control-law gains and a variation in the control-law itself.

Factors affecting degradation of dimethyl sulfoxide (DMSO) by fluidized-bed Fenton process.

PubMed

Bellotindos, Luzvisminda M; Lu, Meng-Hsuan; Methatham, Thanakorn; Lu, Ming-Chun

2014-12-01

In this study, the target compound is dimethyl sulfoxide (DMSO), which is used as a photoresist stripping solvent in the semiconductor and thin-film transistor liquid crystal display (TFT-LCD) manufacturing processes. The effects of the operating parameters (pH, Fe(2+) and H2O2 concentrations) on the degradation of DMSO in the fluidized-bed Fenton process were examined. This study used the Box-Behnken design (BBD) to investigate the optimum conditions of DMSO degradation. The highest DMSO removal was 98 % for pH 3, when the H2O2 to Fe(2+) molar ratio was 12. At pH 2 and 4, the highest DMSO removal was 82 %, when the H2O2 to Fe(2+) molar ratio was 6.5. The correlation of DMSO removal showed that the effect of the parameters on DMSO removal followed the order Fe(2+) > H2O2 > pH. From the BBD prediction, the optimum conditions were pH 3, 5 mM of Fe(2+), and 60 mM of H2O2. The difference between the experimental value (98 %) and the predicted value (96 %) was not significant. The removal efficiencies of DMSO, chemical oxygen demand (COD), total organic carbon (TOC), and iron in the fluidized-bed Fenton process were higher than those in the traditional Fenton process.

A novel fast and flexible technique of radical kinetic behaviour investigation based on pallet for plasma evaluation structure and numerical analysis

NASA Astrophysics Data System (ADS)

Malinowski, Arkadiusz; Takeuchi, Takuya; Chen, Shang; Suzuki, Toshiya; Ishikawa, Kenji; Sekine, Makoto; Hori, Masaru; Lukasiak, Lidia; Jakubowski, Andrzej

2013-07-01

This paper describes a new, fast, and case-independent technique for sticking coefficient (SC) estimation based on pallet for plasma evaluation (PAPE) structure and numerical analysis. Our approach does not require complicated structure, apparatus, or time-consuming measurements but offers high reliability of data and high flexibility. Thermal analysis is also possible. This technique has been successfully applied to estimation of very low value of SC of hydrogen radicals on chemically amplified ArF 193 nm photoresist (the main goal of this study). Upper bound of our technique has been determined by investigation of SC of fluorine radical on polysilicon (in elevated temperature). Sources of estimation error and ways of its reduction have been also discussed. Results of this study give an insight into the process kinetics, and not only they are helpful in better process understanding but additionally they may serve as parameters in a phenomenological model development for predictive modelling of etching for ultimate CMOS topography simulation.

The Systematic Tool to Reduce Inappropriate Prescribing (STRIP): Combining implicit and explicit prescribing tools to improve appropriate prescribing.

PubMed

Drenth-van Maanen, A Clara; Leendertse, Anne J; Jansen, Paul A F; Knol, Wilma; Keijsers, Carolina J P W; Meulendijk, Michiel C; van Marum, Rob J

2018-04-01

Inappropriate prescribing is a major health care issue, especially regarding older patients on polypharmacy. Multiple implicit and explicit prescribing tools have been developed to improve prescribing, but these have hardly ever been used in combination. The Systematic Tool to Reduce Inappropriate Prescribing (STRIP) combines implicit prescribing tools with the explicit Screening Tool to Alert physicians to the Right Treatment and Screening Tool of Older People's potentially inappropriate Prescriptions criteria and has shared decision-making with the patient as a critical step. This article describes the STRIP and its ability to identify potentially inappropriate prescribing. The STRIP improved general practitioners' and final-year medical students' medication review skills. The Web-application STRIP Assistant was developed to enable health care providers to use the STRIP in daily practice and will be incorporated in clinical decision support systems. It is currently being used in the European Optimizing thERapy to prevent Avoidable hospital admissions in the Multimorbid elderly (OPERAM) project, a multicentre randomized controlled trial involving patients aged 75 years and older using multiple medications for multiple medical conditions. In conclusion, the STRIP helps health care providers to systematically identify potentially inappropriate prescriptions and medication-related problems and to change the patient's medication regimen in accordance with the patient's needs and wishes. This article describes the STRIP and the available evidence so far. The OPERAM study is investigating the effect of STRIP use on clinical and economic outcomes. © 2017 John Wiley & Sons, Ltd.

Liga developer apparatus system

DOEpatents

Boehme, Dale R.; Bankert, Michelle A.; Christenson, Todd R.

2003-01-01

A system to fabricate precise, high aspect ratio polymeric molds by photolithograpic process is described. The molds for producing micro-scale parts from engineering materials by the LIGA process. The invention is a developer system for developing a PMMA photoresist having exposed patterns comprising features having both very small sizes, and very high aspect ratios. The developer system of the present invention comprises a developer tank, an intermediate rinse tank and a final rinse tank, each tank having a source of high frequency sonic agitation, temperature control, and continuous filtration. It has been found that by moving a patterned wafer, through a specific sequence of developer/rinse solutions, where an intermediate rinse solution completes development of those portions of the exposed resist left undeveloped after the development solution, by agitating the solutions with a source of high frequency sonic vibration, and by adjusting and closely controlling the temperatures and continuously filtering and recirculating these solutions, it is possible to maintain the kinetic dissolution of the exposed PMMA polymer as the rate limiting step.

Development of a low-cost x-ray mask for high-aspect-ratio MEM smart structures

NASA Astrophysics Data System (ADS)

Ajmera, Pratul K.; Stadler, Stefan; Abdollahi, Neda

1998-07-01

A cost-effective process with short fabrication time for making x-ray masks for research and development purposes is described here for fabricating high-aspect ratio microelectromechanical structures using synchrotron based x- ray lithography. Microscope cover glass slides as membrane material is described. Slides with an initial thickness of 175 micrometers are etched to a thickness in the range of 10 - 25 micrometers using a diluted HF and buffered hydrofluoric acid solutions. The thinned slides are glued on supportive mask frames and sputtered with a chromium/silver sandwich layer which acts as a plating base layer for the deposition of the gold absorber. The judicial choice of glue and mask frame material are significant parameters in a successful fabrication process. Gold absorber structures are electroplated on the membrane. Calculations are done for contrast and dose ratio obtained in the photoresist after synchrotron radiation as a function of the mask design parameters. Exposure experiments are performed to prove the applicability of the fabricated x-ray mask.

Efficacy of adhesive strips to reduce postoperative periorbital edema and ecchymosis following rhinoplasty

PubMed

Tatar, Sedat; Bulam, Mehmet Hakan; Özmen, Selahattin

2018-02-23

Background/aim: Periorbital edema and ecchymosis may develop following rhinoplasty. The aim of this study was to assess the efficacy of adhesive strip application on the upper and lower eyelids to reduce postoperative edema and ecchymosis following rhinoplasty. Materials and methods: The eyelids of one side were randomly selected, and an adhesive strip of standard size and number was applied at the end of the operation. The strips were removed at postoperative day 3; photos of the eyes were taken at days 3 and 7. Edema and ecchymosis were graded on a scale from 1 to 4. The ecchymosis areas on the lower and upper eyelids were measured and compared in square centimeters. Results: The mean ecchymosis area of the lower eyelid on the side of the adhesive strip and on the side without the strip was 1.63 cm2 and 3.32 cm2 in the early period, respectively. It was 1.15 cm2 on the upper eyelid on the side of the adhesive strip, and 1.87 cm2 on the side without the strip. It was 0.224 cm2 on the side of the adhesive strip, and 0.498 cm2 on the side without the adhesive strip in the late period. Conclusion: Applying adhesive strips reduces periorbital edema and ecchymosis.

Cross Coating Weight Control by Electromagnetic Strip Stabilization at the Continuous Galvanizing Line of ArcelorMittal Florange

NASA Astrophysics Data System (ADS)

Guelton, Nicolas; Lopès, Catherine; Sordini, Henri

2016-08-01

In hot dip galvanizing lines, strip bending around the sink roll generates a flatness defect called crossbow. This defect affects the cross coating weight distribution by changing the knife-to-strip distance along the strip width and requires a significant increase in coating target to prevent any risk of undercoating. The already-existing coating weight control system succeeds in eliminating both average and skew coating errors but cannot do anything against crossbow coating errors. It has therefore been upgraded with a flatness correction function which takes advantage of the possibility of controlling the electromagnetic stabilizer. The basic principle is to split, for every gage scan, the coating weight cross profile of the top and bottom sides into two, respectively, linear and non-linear components. The linear component is used to correct the skew error by realigning the knives with the strip, while the non-linear component is used to distort the strip in the stabilizer in such a way that the strip is kept flat between the knives. Industrial evaluation is currently in progress but the first results have already shown that the strip can be significantly flattened between the knives and the production tolerances subsequently tightened without compromising quality.

Lens of controllable optical field with thin film metallic glasses for UV-LEDs.

PubMed

Pan, C T; Chen, Y C; Lin, Po-Hung; Hsieh, C C; Hsu, F T; Lin, Po-Hsun; Chang, C M; Hsu, J H; Huang, J C

2014-06-16

In the exposure process of photolithography, a free-form lens is designed and fabricated for UV-LED (Ultraviolet Light-Emitting Diode). Thin film metallic glasses (TFMG) are adopted as UV reflection layers to enhance the irradiance and uniformity. The Polydimethylsiloxane (PDMS) with high transmittance is used as the lens material. The 3-D fast printing is attempted to make the mold of the lens. The results show that the average irradiance can be enhanced by 6.5~6.7%, and high uniformity of 85~86% can be obtained. Exposure on commercial thick photoresist using this UV-LED system shows 3~5% dimensional deviation, lower than the 6~8% deviation for commercial mercury lamp system. This current system shows promising potential to replace the conventional mercury exposure systems.

Performance of a new test strip for freestyle blood glucose monitoring systems.

PubMed

Lock, John Paul; Brazg, Ronald; Bernstein, Robert M; Taylor, Elizabeth; Patel, Mona; Ward, Jeanne; Alva, Shridhara; Chen, Ting; Welsh, Zoë; Amor, Walter; Bhogal, Claire; Ng, Ronald

2011-01-01

a new strip, designed to enhance the ease of use and minimize interference of non-glucose sugars, has been developed to replace the current FreeStyle (Abbott Diabetes Care, Alameda, CA) blood glucose test strip. We evaluated the performance of this new strip. laboratory evaluation included precision, linearity, dynamic range, effects of operating temperature, humidity, altitude, hematocrit, interferents, and blood reapplication. System accuracy, lay user performance, and ease of use for finger capillary blood testing and accuracy for venous blood testing were evaluated at clinics. Lay users also compared the speed and ease of use between the new strip and the current FreeStyle strip. for glucose concentrations <75 mg/dL, 73%, 100%, and 100% of the individual capillary blood glucose results obtained by lay users fell within ± 5, 10, and 15 mg/dL, respectively, of the reference. For glucose concentrations ≥75 mg/dL, 68%, 95%, 99%, and 99% of the lay user results fell within  ±  5%, 10%, 15%, and 20%, respectively, of the reference. Comparable accuracy was obtained in the venous blood study. Lay users found the new test strip easy to use and faster and easier to use than the current FreeStyle strip. The new strip maintained accuracy under various challenging conditions, including high concentrations of various interferents, sample reapplication up to 60 s, and extremes in hematocrit, altitude, and operating temperature and humidity. our results demonstrated excellent accuracy of the new FreeStyle test strip and validated the improvements in minimizing interference and enhancing ease of use.

360-degrees profilometry using strip-light projection coupled to Fourier phase-demodulation.

PubMed

Servin, Manuel; Padilla, Moises; Garnica, Guillermo

2016-01-11

360 degrees (360°) digitalization of three dimensional (3D) solids using a projected light-strip is a well-established technique in academic and commercial profilometers. These profilometers project a light-strip over the digitizing solid while the solid is rotated a full revolution or 360-degrees. Then, a computer program typically extracts the centroid of this light-strip, and by triangulation one obtains the shape of the solid. Here instead of using intensity-based light-strip centroid estimation, we propose to use Fourier phase-demodulation for 360° solid digitalization. The advantage of Fourier demodulation over strip-centroid estimation is that the accuracy of phase-demodulation linearly-increases with the fringe density, while in strip-light the centroid-estimation errors are independent. Here we proposed first to construct a carrier-frequency fringe-pattern by closely adding the individual light-strip images recorded while the solid is being rotated. Next, this high-density fringe-pattern is phase-demodulated using the standard Fourier technique. To test the feasibility of this Fourier demodulation approach, we have digitized two solids with increasing topographic complexity: a Rubik's cube and a plastic model of a human-skull. According to our results, phase demodulation based on the Fourier technique is less noisy than triangulation based on centroid light-strip estimation. Moreover, Fourier demodulation also provides the amplitude of the analytic signal which is a valuable information for the visualization of surface details.

Hemolytic anemia caused by aortic flap and inversion of felt strip after ascending aorta replacement.

PubMed

Sakaguchi, Masayuki; Takano, Tamaki

2016-08-02

Hemolysis related to a kinked prosthetic graft or inner felt strip is a very rare complication after aortic surgery. We describe herein a case of hemolytic anemia that developed due to aortic flap of the dissection and inversion of an inner felt strip that was applied at the proximal anastomosis of a replaced ascending aorta 10 years previously. A 74-year-old woman presented with consistent hemolytic anemia 10 years after replacement of the ascending aorta to treat Stanford type A acute aortic dissection. The cause of hemolysis was attributed to mechanical injury of red blood cells at a site of stenosis caused by aortic flap of the dissection and inversion of the felt strip used for the proximal anastomosis. Repeated resection of the strip and graft replacement of the ascending aorta resolved this problem. We considered that blood flow disrupted by a jet of blood at the site of the proximal inner felt strip was the cause of severe hemolysis, we describe rare hemolytic anemia at the site of aortic flap and inverted felt strip after replacement of the ascending aorta.

Range gated strip proximity sensor

DOEpatents

McEwan, T.E.

1996-12-03

A range gated strip proximity sensor uses one set of sensor electronics and a distributed antenna or strip which extends along the perimeter to be sensed. A micro-power RF transmitter is coupled to the first end of the strip and transmits a sequence of RF pulses on the strip to produce a sensor field along the strip. A receiver is coupled to the second end of the strip, and generates a field reference signal in response to the sequence of pulse on the line combined with received electromagnetic energy from reflections in the field. The sensor signals comprise pulses of radio frequency signals having a duration of less than 10 nanoseconds, and a pulse repetition rate on the order of 1 to 10 MegaHertz or less. The duration of the radio frequency pulses is adjusted to control the range of the sensor. An RF detector feeds a filter capacitor in response to received pulses on the strip line to produce a field reference signal representing the average amplitude of the received pulses. When a received pulse is mixed with a received echo, the mixing causes a fluctuation in the amplitude of the field reference signal, providing a range-limited Doppler type signature of a field disturbance. 6 figs.

FIBER AND INTEGRATED OPTICS: Waveguide characteristics of real optical strip waveguides

NASA Astrophysics Data System (ADS)

Shmal'ko, A. V.; Frolov, V. V.

1990-01-01

A study is reported of the influence of the parameters of real thin-film optical strip waveguides on their waveguide characteristics (propagation constants, localization of the mode field, etc.) allowing for the presence of transition layers in a transverse cross section of the base planar waveguide, for the real geometry of this section (which is nearly trapezoidal), and for the thickness of the guiding strip. Analytic expressions are obtained for the optical confinement coefficient and the effective mode format of a weakly guiding symmetric strip waveguide. It is shown that the coefficient representing the fundamental E11x(y) mode is practically independent of the relative thickness t /h (h is the thickness of the base planar waveguide) of the guiding strip provided t /h>=0.5. The corrections to the normalized effective refractive indices of the base planar and strip waveguides are found in order to allow for the real geometry and for the refractive index profile in the strip waveguide.

The problem of a finite strip compressed between two rough rigid stamps

NASA Technical Reports Server (NTRS)

Gupta, G. D.

1975-01-01

A finite strip compressed between two rough rigid stamps is considered. The elastostatic problem is formulated in terms of a singular integral equation from which the proper stress singularities at the corners are determined. The singular integral equation is solved numerically to determine the stresses along the fixed ends of the strip. The effect of material properties and strip geometry on the stress-intensity factor is presented graphically.

Organic Matter Decomposition following Harvesting and Site Preparation of a Forested Wetland

Treesearch

Carl C. Trettin; M. Davidian; M.F. Jurgensen; R. Lea

1996-01-01

Organic matter accumulation is an important process that affects ecosystem function in many northern wetlands. The cotton strip assay (CSA)was used to measure the effect of harvesting and two different site preparation treatments, bedding and trenching, on organic matter decomposition in a forested wetland. A Latin square experimental design was used to determine the...

Practical holography III; Proceedings of the Meeting, Los Angeles, CA, Jan. 17, 18, 1989

NASA Astrophysics Data System (ADS)

Benton, Stephen A.

Various papers on practical holography are presented. Individual topics addressed include: design of large format commercial display holograms, design of a one-step full-color holographic recording system, color reflection holography, full color rainbow hologram using a photoresist plate, secondary effects in processing holograms, archival properties of holograms, survey of properties of volume holographic materials, image stability of DMP-128 holograms, activation monitor for DMP-128, microwave drying effects on dichromated gelatin holograms, sensitization process of dichromated gelatin, holographic optics for vision systems, holographic fingerprint sensor, cross-talk and cross-coupling in multiplexed holographic gratings, compact illuminators for transmission holograms, solar holoconcentrators in dichromated grains, three-dimensional display of scientific data, holographic liquid crystal displays, in situ swelling for hologaphic color control.

Optical micromachined ultrasound transducers (OMUT)--a new approach for high-frequency transducers.

PubMed

Tadayon, Mohammad Amin; Ashkenazi, Shai

2013-09-01

The sensitivity and reliability of piezoelectric ultrasound transducers severely degrade in applications requiring high frequency and small element size. Alternative technologies such as capacitive micromachined ultrasound transducers (CMUT) and optical sensing and generation of ultrasound have been proposed and studied for several decades. In this paper, we present a new type of device based on optical micromachined ultrasound transducer (OMUT) technology. OMUTs rely on microfabrication techniques to construct micrometerscale air cavities capped by an elastic membrane. A modified photoresist bonding process has been developed to facilitate the fabrication of these devices. We will describe the design, fabrication, and testing of prototype OMUT devices which implement a receive-only function. Future design modifications are proposed for incorporating complete transmit¿receive functionality in a single element.

Nanocolloidal gold-based immuno-dip strip assay for rapid detection of Sudan red I in food samples.

PubMed

Wang, Jia; Wang, Zhanhui; Liu, Jing; Li, Hao; Li, Qing X; Li, Ji; Xu, Ting

2013-02-15

A semiquantitative dip strip assay was developed using nanocolloidal gold-labelled monoclonal antibody (Mab) 8A10 for the rapid detection of Sudan red I in food samples. A protein-Sudan red I conjugate was coated on a nitro cellulose membrane strip in a defined test line. In flow of the complex of nanocolloidal gold labelled-Mab and Sudan red I along the strip, intensive red colour that was formed in the test line reflected the Sudan red I concentration. The test required 10 min and had a visual limit of detection of 10 ng/g Sudan red I in tomato sauce and chilli powder samples. The results of the strip assay agreed well with those of a high performance liquid chromatography method for both spiked and real commercial samples. The strip was stable for at least 2 months at 4°C. The strip assay offers the potential as a useful rapid and simple method for screening of Sudan red I in food samples. Copyright © 2012 Elsevier Ltd. All rights reserved.

Diffraction grating transmission efficiencies for XUV and soft X rays. [for HEAO-B extrasolar astronomy

NASA Technical Reports Server (NTRS)

Schnopper, H. W.; Van Speybroeck, L. P.; Delvaille, J. P.; Epstein, A.; Kaellne, E.; Bachrach, R. Z.; Dijkstra, J.; Lantward, L.

1977-01-01

The manufacture and properties of a grating intended for extrasolar X-ray studies are described. The manufacturing process uses a split laser beam exposing an interference pattern on the photoresist-coated glass plated with a nickel parting layer. The grating, supporting structure, and mounting frame are electrodeposited on the nickel parting layer, and the final product is lifted from the glass substrate by selective etching of the nickel. A model was derived which relates the number of counts received in a given order m as a function of photon wavenumber. A 4-deg beam line was used to measure the efficiencies of gold transmission gratings for diffraction of X-rays in the range of 45 to 275 eV. The experimental results are in good agreement with model calculations.

Measuring Collective Intelligence in Human-Machine Systems

DTIC Science & Technology

2013-12-09

addition, the Doonesbury comic strip on July 15, 2012, was based on the results of our research (see http://doonesbury. slate.com/strip/archive/2012/07/15...The comic strip includes one "error" in its summary of our research results. The Doonesbury character says that "Group IQ doesn’t correlate with... comic strip correspond very closely to the actual results of our research as published in Science magazine. Other honors include: (a) Malone

Method for making circular tubular channels with two silicon wafers

DOEpatents

Yu, C.M.; Hui, W.C.

1996-11-19

A two-wafer microcapillary structure is fabricated by depositing boron nitride (BN) or silicon nitride (Si{sub 3}N{sub 4}) on two separate silicon wafers (e.g., crystal-plane silicon with [100] or [110] crystal orientation). Photolithography is used with a photoresist to create exposed areas in the deposition for plasma etching. A slit entry through to the silicon is created along the path desired for the ultimate microcapillary. Acetone is used to remove the photoresist. An isotropic etch, e.g., such as HF/HNO{sub 3}/CH{sub 3}COOH, then erodes away the silicon through the trench opening in the deposition layer. A channel with a half-circular cross section is then formed in the silicon along the line of the trench in the deposition layer. Wet etching is then used to remove the deposition layer. The two silicon wafers are aligned and then bonded together face-to-face to complete the microcapillary. 11 figs.

Micro-strip sensors based on CVD diamond

NASA Astrophysics Data System (ADS)

Adam, W.; Berdermann, E.; Bergonzo, P.; Bertuccio, G.; Bogani, F.; Borchi, E.; Brambilla, A.; Bruzzi, M.; Colledani, C.; Conway, J.; D'Angelo, P.; Dabrowski, W.; Delpierre, P.; Deneuville, A.; Dulinski, W.; van Eijk, B.; Fallou, A.; Fizzotti, F.; Foulon, F.; Friedl, M.; Gan, K. K.; Gheeraert, E.; Hallewell, G.; Han, S.; Hartjes, F.; Hrubec, J.; Husson, D.; Kagan, H.; Kania, D.; Kaplon, J.; Kass, R.; Koeth, T.; Krammer, M.; Logiudice, A.; Lu, R.; mac Lynne, L.; Manfredotti, C.; Meier, D.; Mishina, M.; Moroni, L.; Oh, A.; Pan, L. S.; Pernicka, M.; Peitz, A.; Perera, L.; Pirollo, S.; Procario, M.; Riester, J. L.; Roe, S.; Rousseau, L.; Rudge, A.; Russ, J.; Sala, S.; Sampietro, M.; Schnetzer, S.; Sciortino, S.; Stelzer, H.; Stone, R.; Suter, B.; Tapper, R. J.; Tesarek, R.; Trischuk, W.; Tromson, D.; Vittone, E.; Walsh, A. M.; Wedenig, R.; Weilhammer, P.; Wetstein, M.; White, C.; Zeuner, W.; Zoeller, M.; RD42 Collaboration

2000-10-01

In this article we present the performance of recent chemical vapour deposition (CVD) diamond micro-strip sensors in beam tests. In addition, we present the first comparison of a CVD diamond micro-strip sensor before and after proton irradiation.

Performance improvements of binary diffractive structures via optimization of the photolithography and dry etch processes

NASA Astrophysics Data System (ADS)

Welch, Kevin; Leonard, Jerry; Jones, Richard D.

2010-08-01

Increasingly stringent requirements on the performance of diffractive optical elements (DOEs) used in wafer scanner illumination systems are driving continuous improvements in their associated manufacturing processes. Specifically, these processes are designed to improve the output pattern uniformity of off-axis illumination systems to minimize degradation in the ultimate imaging performance of a lithographic tool. In this paper, we discuss performance improvements in both photolithographic patterning and RIE etching of fused silica diffractive optical structures. In summary, optimized photolithographic processes were developed to increase critical dimension uniformity and featuresize linearity across the substrate. The photoresist film thickness was also optimized for integration with an improved etch process. This etch process was itself optimized for pattern transfer fidelity, sidewall profile (wall angle, trench bottom flatness), and across-wafer etch depth uniformity. Improvements observed with these processes on idealized test structures (for ease of analysis) led to their implementation in product flows, with comparable increases in performance and yield on customer designs.

High-volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL

NASA Astrophysics Data System (ADS)

Sayan, Safak; Vanelderen, Pieter; Hetel, Iulian; Chan, BT; Raghavan, Praveen; Blanco, Victor; Foubert, Philippe; D'urzo, Lucia; De Simone, Danilo; Vandenberghe, Geert

2017-04-01

There are many knobs available that change the chemical and physical properties of the photoresists to "break" the RLS (Resolution, Sensitivity, Line edge/width roughness) trade-off, however those are not enough today to realize a material to satisfy all requirements at once for 7nm technology and beyond. DDRP improves the ultimate achievable resolution via pattern collapse mitigation, hence the priority of requirements for the EUV photoresist development may be changed with more focus on Sensitivity and LWR. This may potentially provide a new conceptual approach towards EUV PR development for DDRP applications. We have previously demonstrated pattern collapse (PC) mitigation via DDRP on different EUVL photoresists (including different resist platforms), achieving ultimate resolution and exposure latitude improvements [1,2]. In this contribution, we report patterning and material defect performance of HVM compatible (all aqueous) dry development rinse material. We will also report on process window improvement on 2-dimensional metal structures towards standard cell size reduction with elimination of mask layer(s) using single EUV exposure.

Calibrating ultrasonic test equipment for checking thin metal strip stock

NASA Technical Reports Server (NTRS)

Peterson, R. M.

1967-01-01

Calibration technique detects minute laminar-type discontinuities in thin metal strip stock. Patterns of plastic tape are preselected to include minutely calculated discontinuities and the tape is applied to the strip stock to intercept the incident sonic beam.

Maskless Lithography Using Negative Photoresist Material: Impact of UV Laser Intensity on the Cured Line Width

NASA Astrophysics Data System (ADS)

Mohammed, Mohammed Ziauddin; Mourad, Abdel-Hamid I.; Khashan, Saud A.

2018-04-01

The application of maskless lithography technique on negative photoresist material is investigated in this study. The equipment used in this work is designed and built especially for maskless lithography applications. The UV laser of 405 nm wavelength with 0.85 Numerical Aperture is selected for direct laser writing. All the samples are prepared on a glass substrate. Samples are tested at different UV laser intensities and different stage velocities in order to study the impact on patterned line width. Three cases of spin coated layers of thickness 90 μm, 40 μm, and 28 μm on the substrate are studied. The experimental results show that line width has a generally increasing trend with intensity. However, a decreasing trend was observed for increasing velocity. The overall performance shows that the mr-DWL material is suitable for direct laser writing systems.

Coating and Patterning Functional Materials for Large Area Electrofluidic Arrays

PubMed Central

Wu, Hao; Tang, Biao; Hayes, Robert A.; Dou, Yingying; Guo, Yuanyuan; Jiang, Hongwei; Zhou, Guofu

2016-01-01

Industrialization of electrofluidic devices requires both high performance coating laminates and efficient material utilization on large area substrates. Here we show that screen printing can be effectively used to provide homogeneous pin-hole free patterned amorphous fluoropolymer dielectric layers to provide both the insulating and fluidic reversibility required for devices. Subsequently, we over-coat photoresist using slit coating on this normally extremely hydrophobic layer. In this way, we are able to pattern the photoresist by conventional lithography to provide the chemical contrast required for liquids dosing by self-assembly and highly-reversible electrofluidic switching. Materials, interfacial chemistry, and processing all contribute to the provision of the required engineered substrate properties. Coating homogeneity as characterized by metrology and device performance data are used to validate the methodology, which is well-suited for transfer to high volume production in existing LCD cell-making facilities. PMID:28773826

Concentration gradient induced morphology evolution of silica nanostructure growth on photoresist-derived carbon micropatterns

NASA Astrophysics Data System (ADS)

Liu, Dan; Shi, Tielin; Xi, Shuang; Lai, Wuxing; Liu, Shiyuan; Li, Xiaoping; Tang, Zirong

2012-09-01

The evolution of silica nanostructure morphology induced by local Si vapor source concentration gradient has been investigated by a smart design of experiments. Silica nanostructure or their assemblies with different morphologies are obtained on photoresist-derived three-dimensional carbon microelectrode array. At a temperature of 1,000°C, rope-, feather-, and octopus-like nanowire assemblies can be obtained along with the Si vapor source concentration gradient flow. While at 950°C, stringlike assemblies, bamboo-like nanostructures with large joints, and hollow structures with smaller sizes can be obtained along with the Si vapor source concentration gradient flow. Both vapor-liquid-solid and vapor-quasiliquid-solid growth mechanisms have been applied to explain the diverse morphologies involving branching, connecting, and batch growth behaviors. The present approach offers a potential method for precise design and controlled synthesis of nanostructures with different features.

Method for making circular tubular channels with two silicon wafers

DOEpatents

Yu, Conrad M.; Hui, Wing C.

1996-01-01

A two-wafer microcapillary structure is fabricated by depositing boron nitride (BN) or silicon nitride (Si.sub.3 N.sub.4) on two separate silicon wafers (e.g., crystal-plane silicon with [100] or [110] crystal orientation). Photolithography is used with a photoresist to create exposed areas in the deposition for plasma etching. A slit entry through to the silicon is created along the path desired for the ultimate microcapillary. Acetone is used to remove the photoresist. An isotropic etch, e.g., such as HF/HNO.sub.3 /CH.sub.3 COOH, then erodes away the silicon through the trench opening in the deposition layer. A channel with a half-circular cross section is then formed in the silicon along the line of the trench in the deposition layer. Wet etching is then used to remove the deposition layer. The two silicon wafers are aligned and then bonded together face-to-face to complete the microcapillary.

Fabrication of hexagonal star-shaped and ring-shaped patterns arrays by Mie resonance sphere-lens-lithography

NASA Astrophysics Data System (ADS)

Liu, Xianchao; Wang, Jun; Li, Ling; Gou, Jun; Zheng, Jie; Huang, Zehua; Pan, Rui

2018-05-01

Mie resonance sphere-lens-lithography has proved to be a good candidate for fabrication of large-area tunable surface nanopattern arrays. Different patterns on photoresist surface are obtained theoretically by adjusting optical coupling among neighboring spheres with different gap sizes. The effect of light reflection from the substrate on the pattern produced on the photoresist with a thin thickness is also discussed. Sub-micron hexagonal star-shaped and ring-shaped patterns arrays are achieved with close-packed spheres arrays and spheres arrays with big gaps, respectively. Changing of star-shaped vertices is induced by different polarization of illumination. Experimental results agree well with the simulation. By using smaller resonance spheres, sub-400 nm star-shaped and ring-shaped patterns can be realized. These tunable patterns are different from results of previous reports and have enriched pattern morphology fabricated by sphere-lens-lithography, which can find application in biosensor and optic devices.

Coating and Patterning Functional Materials for Large Area Electrofluidic Arrays.

PubMed

Wu, Hao; Tang, Biao; Hayes, Robert A; Dou, Yingying; Guo, Yuanyuan; Jiang, Hongwei; Zhou, Guofu

2016-08-19

Industrialization of electrofluidic devices requires both high performance coating laminates and efficient material utilization on large area substrates. Here we show that screen printing can be effectively used to provide homogeneous pin-hole free patterned amorphous fluoropolymer dielectric layers to provide both the insulating and fluidic reversibility required for devices. Subsequently, we over-coat photoresist using slit coating on this normally extremely hydrophobic layer. In this way, we are able to pattern the photoresist by conventional lithography to provide the chemical contrast required for liquids dosing by self-assembly and highly-reversible electrofluidic switching. Materials, interfacial chemistry, and processing all contribute to the provision of the required engineered substrate properties. Coating homogeneity as characterized by metrology and device performance data are used to validate the methodology, which is well-suited for transfer to high volume production in existing LCD cell-making facilities.

P-stop isolation study of irradiated n-in-p type silicon strip sensors for harsh radiation environments

NASA Astrophysics Data System (ADS)

Printz, Martin; CMS Tracker Collaboration

2016-09-01

In order to determine the most radiation hard silicon sensors for the CMS Experiment after the Phase II Upgrade in 2023 a comprehensive study of silicon sensors after a fluence of up to 1.5 ×1015neq /cm2 corresponding to 3000fb-1 after the HL-LHC era has been carried out. The results led to the decision that the future Outer Tracker (20 cm < R < 110 cm) of CMS will consist of n-in-p type sensors. This technology is more radiation hard but also the manufacturing is more challenging compared to p-in-n type sensors due to additional process steps in order to suppress the accumulation of electrons between the readout strips. One possible isolation technique of adjacent strips is the p-stop structure which is a p-type material implantation with a certain pattern for each individual strip. However, electrical breakdown and charge collection studies indicate that the process parameters of the p-stop structure have to be carefully calibrated in order to achieve a sufficient strip isolation but simultaneously high breakdown voltages. Therefore a study of the isolation characteristics with four different silicon sensor manufacturers has been executed in order to determine the most suitable p-stop parameters for the harsh radiation environment during HL-LHC. Several p-stop doping concentrations, doping depths and different p-stop pattern have been realized and experiments before and after irradiation with protons and neutrons have been performed and compared to T-CAD simulation studies with Synopsys Sentaurus. The measurements combine the electrical characteristics measured with a semi-automatic probestation with Sr90 signal measurements and analogue readout. Furthermore, some samples have been investigated with the help of a cosmic telescope with high resolution allowing charge collection studies of MIPs penetrating the sensor between two strips.

Direct nanopatterning of 100 nm metal oxide periodic structures by Deep-UV immersion lithography.

PubMed

Stehlin, Fabrice; Bourgin, Yannick; Spangenberg, Arnaud; Jourlin, Yves; Parriaux, Olivier; Reynaud, Stéphanie; Wieder, Fernand; Soppera, Olivier

2012-11-15

Deep-UV lithography using high-efficiency phase mask has been developed to print 100 nm period grating on sol-gel based thin layer. High efficiency phase mask has been designed to produce a high-contrast interferogram (periodic fringes) under water immersion conditions for 244 nm laser. The demonstration has been applied to a new developed immersion-compatible sol-gel layer. A sol-gel photoresist prepared from zirconium alkoxides caped with methacrylic acids was developed to achieve 50 nm resolution in a single step exposure. The nanostructures can be thermally annealed into ZrO(2). Such route considerably simplifies the process for elaborating nanopatterned surfaces of transition metal oxides, and opens new routes for integrating materials of interest for applications in the field of photocatalysis, photovoltaic, optics, photonics or microelectronics.

Process for Fabrication of Superconducting Vias for Electrical Connection to Groundplane in Cryogenic Detectors

NASA Technical Reports Server (NTRS)

Denis, Kevin L. (Inventor)

2018-01-01

Disclosed are systems, methods, and non-transitory computer-readable storage media for fabrication of silicon on insulator (SOI) wafers with a superconductive via for electrical connection to a groundplane. Fabrication of the SOI wafer with a superconductive via can involve depositing a superconducting groundplane onto a substrate with the superconducting groundplane having an oxidizing layer and a non-oxidizing layer. A layer of monocrystalline silicon can be bonded to the superconducting groundplane and a photoresist layer can be applied to the layer of monocrystalline silicon and the SOI wafer can be etched with the oxygen rich etching plasma, resulting in a monocrystalline silicon top layer with a via that exposes the superconducting groundplane. Then, the fabrication can involve depositing a superconducting surface layer to cover the via.

Analysis of a unidirectional, symmetric buffer strip laminate with damage

NASA Technical Reports Server (NTRS)

Dharani, L. R.; Goree, J. G.

1984-01-01

A method for predicting the fracture behavior of hybrid buffer strip laminates is presented in which the classical shear-lag model is used to represent the shear stress distribution between adjacent fibers. The method is demonstrated by applying it to a notched graphite/epoxy laminate, and the results show clearly the manner in which the most efficient combination of buffer strip properties can be selected in order to arrest the crack. The ultimate failure stress of the laminate is plotted vs the buffer strip width. It is shown that in the case of graphite-epoxy and S-glass epoxy laminates, the optimum buffer strip spacing to width ratio should be about four to one.

Effect of post-spawning broodfish diet with high lipid content and n-3 fatty acids on reproductive performance of channel catfish

USDA-ARS?s Scientific Manuscript database

Channel x blue hybrid catfish are exclusively produced by hormone-induced spawning protocols and this process has proved to be a reliable method to mass produce hybrid catfish in hatcheries. Strip spawning of channel catfish needs a continuous and reliable supply of mature (gravid) fish during the...

Strip clearcutting to regenerate northern hardwoods.

Treesearch

Frederick T. Metzger

1980-01-01

Describes results of strip clearcutting trials in mature northern hardwood and hemlock-hardwood stands in the Lake States. Two strip width and orientations were tested, with and without herbicide treatment of the advance regeneration. Establishment, growth, and species composition of the regeneration were assessed.

A 3D CZT high resolution detector for x- and gamma-ray astronomy

NASA Astrophysics Data System (ADS)

Kuvvetli, I.; Budtz-Jørgensen, C.; Zappettini, A.; Zambelli, N.; Benassi, G.; Kalemci, E.; Caroli, E.; Stephen, J. B.; Auricchio, N.

2014-07-01

At DTU Space we have developed a high resolution three dimensional (3D) position sensitive CZT detector for high energy astronomy. The design of the 3D CZT detector is based on the CZT Drift Strip detector principle. The position determination perpendicular to the anode strips is performed using a novel interpolating technique based on the drift strip signals. The position determination in the detector depth direction, is made using the DOI technique based the detector cathode and anode signals. The position determination along the anode strips is made with the help of 10 cathode strips orthogonal to the anode strips. The position resolutions are at low energies dominated by the electronic noise and improve therefore with increased signal to noise ratio as the energy increases. The achievable position resolution at higher energies will however be dominated by the extended spatial distribution of the photon produced ionization charge. The main sources of noise contribution of the drift signals are the leakage current between the strips and the strip capacitance. For the leakage current, we used a metallization process that reduces the leakage current by means of a high resistive thin layer between the drift strip electrodes and CZT detector material. This method was applied to all the proto type detectors and was a very effective method to reduce the surface leakage current between the strips. The proto type detector was recently investigated at the European Synchrotron Radiation Facility, Grenoble which provided a fine 50 × 50 μm2 collimated X-ray beam covering an energy band up to 600 keV. The Beam positions are resolved very well with a ~ 0.2 mm position resolution (FWHM ) at 400 keV in all directions.

Characterization of sub-0.18-μm critical dimension pattern collapse for yield improvement

NASA Astrophysics Data System (ADS)

Zhong, Tom X.; Gurer, Emir; Lee, Ed C.; Bai, Hong; Gendron, Bill; Krishna, Murthy S.; Reynolds, Reese M.

1999-09-01

In this study, we demonstrate that surface-resist interface interactions are becoming more crucial in DUV lithography as we enter deep into the sub-wavelength era of smaller critical dimension (CD) size and high aspect ratio. This interaction reveals itself as an adhesion reduction of the resist film due to the smaller contact area between the feature and the substrate. Considerable yield improvements in a manufacturing environment can be realized if pattern collapsing of smaller features is prevented by means of proper priming. In addition, next generation photoresist processing equipments must be able to deliver excellent on-wafer results with minimum chemical consumption as environmental health and safety (EHS) requirements are better appreciated in the marketplace. HMDS is not only highly toxic but it is also a prime threat to CD control of most deep ultra violet (DUV) photoresists used for sub-0.18 micrometer design rules. The by-product NH3 created during priming process with HMDS can neutralize the photo-acid created during the exposure step. There are many technical opportunities in this usually neglected priming process step. In this study, we characterized sub-0.18 micrometer isolated line pattern collapse for UV5 resist on bare Si wafers by using a scanning electron microscope (SEM). The smallest line width printability on wafers primed with different contact angles was analyzed by using both top down and cross section SEM images. Our results show that there is a strong effect of substrate surface and film interface interaction on device yields. More specifically, there is a strong correlation between pattern integrity of features down to 115 nm and vapor prime process conditions. In general, wafers with higher contact angle can support smaller line widths. These results suggest that higher contact angle than the current specification will be required for sub-0.1 micrometer design rule for improved yield. An alternative material to HMDS will probably be needed due to more stringent future requirements and weak bonding characteristics of HMDS. Based on the result of this study, we propose an HMDS consumption reduction scheme for line-widths above 0.2 micrometer. There are many priming-related modular and system level technical enhancements that can be designed in the next generation photoresist processing tools in order to extend 248 nm lithography towards smaller feature sizes.

High-performance polymer waveguide devices via low-cost direct photolithography process

NASA Astrophysics Data System (ADS)

Wang, Jianguo; Shustack, Paul J.; Garner, Sean M.

2002-09-01

All-optical networks provide unique opportunities for polymer waveguide devices because of their excellent mechanical, thermo-optic, and electro-optic properties. Polymer materials and components have been viewed as a viable solution for metropolitan and local area networks where high volume and low cost components are needed. In this paper, we present our recent progress on the design and development of photoresist-like highly fluorinated maleimide copolymers including waveguide fabrication and optical testing. We have developed and synthesized a series of thermally stable, (Tg>150 oC, Td>300 oC) highly fluorinated (>50%) maleimide copolymers by radical co-polymerization of halogenated maleimides with various halogenated co-monomers. A theoretical correlation between optical loss and different co-polymer structures has been quantitatively established from C-H overtone analysis. We studied this correlation through design and manipulation of the copolymer structure by changing the primary properties such as molecular weight, copolymer composition, copolymer sequence distribution, and variations of the side chain including photochemically functional side units. Detailed analysis has been obtained using various characterization methods such as (H, C13, F19) NMR, UV-NIR, FTIR, GPC and so forth. The co-polymers exhibit excellent solubility in ketone solvents and high quality thin films can be prepared by spin coating. The polymer films were found to have a refractive index range of 1.42-1.67 and optical loss in the range of 0.2 to 0.4 dB/cm at 1550nm depending on the composition as extrapolated from UV-NIR spectra. When glycidyl methacrylate is incorporated into the polymer backbone, the material behaves like a negative photoresist with the addition of cationic photoinitiator. The final crosslinked waveguides show excellent optical and thermal properties. The photolithographic processing of the highly fluorinated copolymer material was examined in detail using in-situ FTIR. The influence of various polymer

Deterministic embedding of a single gold nanoparticle into polymeric microstructures by direct laser writing technique

NASA Astrophysics Data System (ADS)

Nguyen, Dam Thuy Trang; Pelissier, Aurélien; Montes, Kevin; Tong, Quang Cong; Ngo, Hoang Minh; Ledoux-Rak, Isabelle; Lai, Ngoc Diep

2016-04-01

We have precisely positioned and embedded a single gold nanoparticle (Au NP) into a desired polymeric photonic structure (PS) using a simple and low-cost technique called low one-photon absorption direct laser writing (LOPA DLW), with a two-step process: identification and fabrication. First, the position of the Au NP was identified with a precision of 20 nm by using DLW technique with ultralow excitation laser power (μW). This power did not induce the polymerization of the photoresist (SU8) due to its low absorption at the excitation wavelength (532 nm). Then, the structure containing the NP was fabricated by using the same DLW system with high excitation power (mW). Different 2D photonic structures have been fabricated, which contain a single Au NP at desired position. In particular, we obtained a microsphere instead of a micropillar at the position of the Au NP. The formation of such microsphere was explained by the thermal effect of the Au NP at the wavelength of 532 nm, which induced thermal polymerization of surrounding photoresist. The effect of the post-exposure bake on the quality of structures was taken into account, revealing a more efficient fabrication way by exploiting the local thermal effect of the laser. We studied further the influence of the NP size on the NP/PS coupling by investigating the fabrication and fluorescence measurement of Au NPs of different sizes: 10, 30, 50, 80, and 100 nm. The photon collection enhancements in each case were 12.9 +/- 2.5, 12.6 +/- 5.6, 3.9 +/- 2.7, 5.9 +/- 4.4, and 6.6 +/- 5.1 times, respectively. The gain in fluorescence could reach up to 36.6 times for 10-nm gold NPs.

Performance of strip seals in Iowa bridges, pilot study.

DOT National Transportation Integrated Search

2001-01-01

A pilot study was conducted on the premature failures of neoprene strip seals in : expansion joints in Iowa bridges. In a relatively large number of bridges, strip seals have : pulled out of the steel extrusions or otherwise failed well before the ex...

SLIIC: System-Level Intelligent Intensive Computing

DTIC Science & Technology

2004-12-01

E M em or y S D R A M :2 56 M B to t Imagine B Host Interface N W S... E M em or y S D R A M :2 56 M B to t Firewire B Connector Firewire A Connector DVI In Connector DVI Out ConnectorHSTL Connector HSTL Connector D eb...6N 7N0 N 2N 3N 1 N+1 2N+ 1 3N+1 (b) Upper strip (c) Output stream from upper strip (d) Lower strip ( e ) Output stream from lower strip (f)

Graphitization in Carbon MEMS and Carbon NEMS

NASA Astrophysics Data System (ADS)

Sharma, Swati

Carbon MEMS (CMEMS) and Carbon NEMS (CNEMS) are an emerging class of miniaturized devices. Due to the numerous advantages such as scalable manufacturing processes, inexpensive and readily available precursor polymer materials, tunable surface properties and biocompatibility, carbon has become a preferred material for a wide variety of future sensing applications. Single suspended carbon nanowires (CNWs) integrated on CMEMS structures fabricated by electrospinning of SU8 photoresist on photolithographially patterned SU8 followed by pyrolysis are utilized for understanding the graphitization process in micro and nano carbon materials. These monolithic CNW-CMEMS structures enable the fabrication of very high aspect ratio CNWs of predefined length. The CNWs thus fabricated display core---shell structures having a graphitic shell with a glassy carbon core. The electrical conductivity of these CNWs is increased by about 100% compared to glassy carbon as a result of enhanced graphitization. We explore various tunable fabrication and pyrolysis parameters to improve graphitization in the resulting CNWs. We also suggest gas-sensing application of the thus fabricated single suspended CNW-CMEMS devices by using the CNW as a nano-hotplate for local chemical vapor deposition. In this thesis we also report on results from an optimization study of SU8 photoresist derived carbon electrodes. These electrodes were applied to the simultaneous detection of traces of Cd(II) and Pb(II) through anodic stripping voltammetry and detection limits as low as 0.7 and 0.8 microgL-1 were achieved. To further improve upon the electrochemical behavior of the carbon electrodes we elucidate a modified pyrolysis technique featuring an ultra-fast temperature ramp for obtaining bubbled porous carbon from lithographically patterned SU8. We conclude this dissertation by suggesting the possible future works on enhancing graphitization as well as on electrochemical applications

A novel approach: high resolution inspection with wafer plane defect detection

NASA Astrophysics Data System (ADS)

Hess, Carl; Wihl, Mark; Shi, Rui-fang; Xiong, Yalin; Pang, Song

2008-05-01

High Resolution reticle inspection is well-established as a proven, effective, and efficient means of detecting yield-limiting mask defects as well as defects which are not immediately yield-limiting yet can enable manufacturing process improvements. Historically, RAPID products have enabled detection of both classes of these defects. The newly-developed Wafer Plane Inspection (WPI) detector technology meets the needs of some advanced mask manufacturers to identify the lithographically-significant defects while ignoring the other non-lithographically-significant defects. Wafer Plane Inspection accomplishes this goal by performing defect detection based on a modeled image of how the mask features would actually print in the photoresist. This has the effect of reducing sensitivity to non-printing defects while enabling higher sensitivity focused in high MEEF areas where small reticle defects still yield significant printing defects on wafers. WPI is a new inspection mode that has been developed by KLA-Tencor and is currently under test with multiple customers. It employs the same transmitted and reflected-light high-resolution images as the industry-standard high-resolution inspections, but with much more sophisticated processing involved. A rigorous mask pattern recovery algorithm is used to convert the transmitted and reflected light images into a modeled representation of the reticle. Lithographic modeling of the scanner is then used to generate an aerial image of the mask. This is followed by resist modeling to determine the exposure of the photoresist. The defect detectors are then applied on this photoresist plane so that only printing defects are detected. Note that no hardware modifications to the inspection system are required to enable this detector. The same tool will be able to perform both our standard High Resolution inspections and the Wafer Plane Inspection detector. This approach has several important features. The ability to ignore non-printing defects and to apply additional effective sensitivity in high MEEF areas enables advanced node development. In addition, the modeling allows the inclusion of important polarization effects that occur in the resist for high NA operation. This allows for the results to better match wafer print results compared to alternate approaches. Finally, the simulation easily allows for the application of arbitrary illumination profiles. With this approach, users of WPI can make use of unique or custom scanner illumination profiles. This allows the more precise modeling of profiles without inspection system hardware modification or loss of company intellectual property. This paper examines WPI in Die:Die mode. Future work includes a review of Die:Database WPI capability.

Strip-bark and Whole-bark Siberian Pine Radial Growth Trends and Implications for Climate Reconstruction

NASA Astrophysics Data System (ADS)

Leland, C.; Cook, E. R.; Andreu-Hayles, L.; Pederson, N.; Hessl, A. E.; Anchukaitis, K. J.; Byambasuren, O.; Nachin, B.; Davi, N. K.; D'Arrigo, R.; Griffin, K. L.; Bishop, D. A.; Rao, M. P.

2017-12-01

Ancient trees can exhibit strip-bark morphology in which a portion of the cambium, the active layer of growth in the stem, dies in response to environmental stress. Partial cambial dieback has been linked to several different ecological and physiological factors, but the causes of dieback vary depending on site conditions. Further, the implications of such morphology on radial growth trends and its importance for tree-ring-based climate reconstructions remain unclear. We investigate the timing and potential environmental drivers of cambial dieback in Pinus sibirica trees from a xeric site in central Mongolia, and compare growth patterns of strip and whole-bark (full cambium) trees over the past 500 years. Cambial dieback occurred primarily on the southern side of trees, and was most common during the cold and dry 19th century. These unfavorable climatic conditions, combined with high exposure to solar radiation, suggested by the orientation of strip bark, might be responsible for cambial dieback. Increasing ring-width trends are gradual in most strip-bark trees, and do not immediately follow dieback dates detected for individual stems. However, a mean ring-width chronology of all strip-bark trees abruptly increases and significantly exceeds ring widths of coeval whole-bark trees in the early 20th century. After standardizing strip and whole-bark series to remove allometric trends, the differences in recent growth trends persist. Before using strip-bark trees for climate reconstruction, we suggest comparing strip and whole-bark ring-width trends in order to determine appropriate methods for removing potential morphology-related growth trends. We extend this study by analyzing stable carbon isotopes in tree rings to evaluate whether there are physiological differences between strip-bark and whole-bark trees, and to determine if δ13C can be used as an additional parameter for climate reconstruction.

Urine specific gravity measurement: reagent strip versus refractometer.

PubMed

Brandon, C A

1994-01-01

To compare the results of urinalysis screenings for specific gravity (SG) using the reagent strip and the refractometer. United Hospital, Grand Forks, North Dakota. United Hospital is a 384-bed teaching hospital. PRODUCT COMPARISON: The Ames Multistix 10 SG reagent strip (Miles, Inc., Elkhart, IN 46515) was compared with the TS Meter (Leica, Inc., Deerfield, IL 60015). The degree of correlation between the results produced by each method. The percentage of difference between the means of the direct strip readings and the refractometer readings was 9.68%. The percentage of difference between the means of the adjusted strip readings and the refractometer readings was 22.58%, which was significantly different. When the direct strip readings and the refractometer readings were plotted together on a graph, the points were widely scattered; this fact, and a correlation coefficient of 0.725, suggest that random error occurred in both methods. Analysis of the slope and intercept of the correlation indicated systematic error. The reagent strip method of measuring SG is accurate only in a narrow range of "average" values, and should not be used as the basis for medical diagnoses.

A Strip Cell in Pyroelectric Devices

PubMed Central

Siao, An-Shen; Chao, Ching-Kong; Hsiao, Chun-Ching

2016-01-01

The pyroelectric effect affords the opportunity to convert temporal temperature fluctuations into usable electrical energy in order to develop abundantly available waste heat. A strip pyroelectric cell, used to enhance temperature variation rates by lateral temperature gradients and to reduce cell capacitance to further promote the induced voltage, is described as a means of improving pyroelectric energy transformation. A precision dicing saw was successfully applied in fabricating the pyroelectric cell with a strip form. The strip pyroelectric cell with a high-narrow cross section is able to greatly absorb thermal energy via the side walls of the strips, thereby inducing lateral temperature gradients and increasing temperature variation rates in a thicker pyroelectric cell. Both simulation and experimentation show that the strip pyroelectric cell improves the electrical outputs of pyroelectric cells and enhances the efficiency of pyroelectric harvesters. The strip-type pyroelectric cell has a larger temperature variation when compared to the trenched electrode and the original type, by about 1.9 and 2.4 times, respectively. The measured electrical output of the strip type demonstrates a conspicuous increase in stored energy as compared to the trenched electrode and the original type, by of about 15.6 and 19.8 times, respectively. PMID:26999134

[Effects of strip planting and fallow rotation on the soil and water loss and water use efficiency of slope farmland].

PubMed

Hou, Xian-Qing; Li, Rong; Han, Qing-Fang; Jia, Zhi-Kuan; Wang, Wei; Yan, Bo; Yang, Bao-Ping

2012-08-01

In order to enhance the soil water-retaining capacity of slope farmland and reduce its soil and water loss, a field study was conducted in 2007-2010 to examine the effects of strip planting and fallow rotation on the soil water regime, soil and water loss characteristics, and water use efficiency of a 10 degrees-15 degrees slope farmland in the arid area of southern Ningxia, Northwest China. Compared with the traditional no-strip planting, strip planting and fallow rotation increased the soil water content in 0-200 cm layer significantly, with an increment of 4.9% -7.0%. Strip planting and fallow rotation pattern could also effectively conserve the soil water in rain season, and obviously improve the soil water regime at crops early growth stages. As compared to no-strip planting, strip planting and fallow rotation increased the soil water content in 0-200 cm layer by 5.4%-8.5%, decreased the surface runoff by 0.7-3.2 m3 x hm(-2), sediment runoff by 0.2-1.9 t x hm(-2), and soil total N loss by 42.1% -73.3%, while improved the crop water use efficiency by 6.1% -24.9% and the precipitation use efficiency by 6.3% -15.3%.

SALT, a dedicated readout chip for high precision tracking silicon strip detectors at the LHCb Upgrade

NASA Astrophysics Data System (ADS)

Bugiel, Sz.; Dasgupta, R.; Firlej, M.; Fiutowski, T.; Idzik, M.; Kuczynska, M.; Moron, J.; Swientek, K.; Szumlak, T.

2016-02-01

The Upstream Tracker (UT) silicon strip detector, one of the central parts of the tracker system of the modernised LHCb experiment, will use a new 128-channel readout ASIC called SALT. It will extract and digitise analogue signals from the UT sensors, perform digital signal processing and transmit a serial output data. The SALT is being designed in CMOS 130 nm process and uses a novel architecture comprising of analog front-end and fast (40 MSps) ultra-low power (<0.5 mW) 6-bit ADC in each channel. The prototype ASICs of important functional blocks, like analogue front-end, 6-bit SAR ADC, PLL, and DLL, were designed, fabricated and tested. A prototype of an 8-channel version of the SALT chip, comprising all important functionalities was also designed and fabricated. The architecture and design of the SALT, together with the selected preliminary tests results, are presented.

A method and technique for installing light-weight fragile, high-temperature fiber insulation

NASA Technical Reports Server (NTRS)

Ballantine, T. J. (Inventor)

1982-01-01

A method of installing fragile, light-weight, high-temperature fiber insulation, particularly where the insulation is to be used as a seal strip providing a high order of thermal barrier insulation is described. The process is based on provision of a strip of the mineral batting cut oversize by a predetermined amount, saturated in a fugitive polymer solution, compressed in a mold, dried and cured to form a rigidized batting material which may be machined to required shape. The machined dimensions would normally be at least nominally less than the dimensions of the cavity to be sealed. After insertion in the cavity, which may be a wire-mesh seal enclosure, the apparatus is subjected to baking at a temperature sufficiently high to cause the resin to burn off cleanly, leaving the batting substantially in its original condition and expanded into the cavity or seal enclosure.

Method and technique for installing light-weight, fragile, high-temperature fiber insulation

NASA Technical Reports Server (NTRS)

Patel, B. C. (Inventor)

1983-01-01

A method of installing fragile, light weight, high temperature fiber insulation, particularly where the insulation is to be used as a seal strip providing a high order of thermal barrier insulation is discussed. The process is based on provision of a strip of the mineral batting cut oversize by a predetermined amount, saturated in a fugitive polymer solution, compressed in a mold, dried and cured to form a rigidized batting material which is machined to required shape. The machine dimensions would normally be at least nominally less than the dimensions of the cavity to be sealed. After insertion in the cavity, which may be a wire-mesh seal enclosure, the apparatus is subjected to baking at a temperature sufficiently high to cause the resin to burn off cleanly, leaving the batting substantially in its original condition and expanded into the cavity or seal enclosure.

Studies with cathode drift chambers for the GlueX experiment at Jefferson Lab

DOE PAGES

Pentchev, L.; Barbosa, F.; Berdnikov, V.; ...

2017-04-22

A drift chamber system consisting of 24 1 m-diameter chambers with both cathode and wire readout (total of 12,672 channels) is operational in Hall D at Jefferson Lab (Virginia). Two cathode strip planes and one wire plane in each chamber register the same avalanche allowing the study of avalanche development, charge induction process, and strip resolution. We demonstrate a method for reconstructing the two-dimensional distribution of the avalanche “center-of-gravity” position around the wire from an 55Fe source with resolutions down to 30 μm. We estimate the azimuthal extent of the avalanche around the wire as a function of the totalmore » charge for an Ar/CO 2 gas mixture. By means of cluster counting using a modified 3 cm-gap chamber, we observe significant space charge effects within the same track, resulting in an extent of the avalanche along the wire.« less

Flexible Faraday Cage with a Twist: Surface Charge on a Möbius Strip

NASA Astrophysics Data System (ADS)

Stewart, Seán

2007-05-01

Once an intriguing topological novelty known only to mathematicians, the Möbius strip has become a source of fascination and inspiration to the layperson and artist alike. Principal among its features are the two strange properties that the Möbius strip is a surface with only one side and one edge. A Möbius strip is readily formed by taking a long rectangular strip of paper and giving one of its ends a half twist before joining it to its other end (see Fig. 1). Given its simplicity, I hoped to profit from its appealing yet counterintuitive nature by designing a simple demonstration experiment that would reveal the intrinsic physical difference between one- and two-sided surfaces.

Reverse-absorbance-modulation-optical lithography for optical nanopatterning at low light levels

DOE Office of Scientific and Technical Information (OSTI.GOV)

Majumder, Apratim, E-mail: apratim.majumder@utah.edu; Wan, Xiaowen; Masid, Farhana

2016-06-15

Absorbance-Modulation-Optical Lithography (AMOL) has been previously demonstrated to be able to confine light to deep sub-wavelength dimensions and thereby, enable patterning of features beyond the diffraction limit. In AMOL, a thin photochromic layer that converts between two states via light exposure is placed on top of the photoresist layer. The long wavelength photons render the photochromic layer opaque, while the short-wavelength photons render it transparent. By simultaneously illuminating a ring-shaped spot at the long wavelength and a round spot at the short wavelength, the photochromic layer transmits only a highly confined beam at the short wavelength, which then exposes themore » underlying photoresist. Many photochromic molecules suffer from a giant mismatch in quantum yields for the opposing reactions such that the reaction initiated by the absorption of the short-wavelength photon is orders of magnitude more efficient than that initiated by the absorption of the long-wavelength photon. As a result, large intensities in the ring-shaped spot are required for deep sub-wavelength nanopatterning. In this article, we overcome this problem by using the long-wavelength photons to expose the photoresist, and the short-wavelength photons to confine the “exposing” beam. Thereby, we demonstrate the patterning of features as thin as λ/4.7 (137 nm for λ = 647 nm) using extremely low intensities (4-30 W/m{sup 2}, which is 34 times lower than that required in conventional AMOL). We further apply a rigorous model to explain our experiments and discuss the scope of the reverse-AMOL process.« less

Enhanced wettability of SU-8 photoresist through a photografting procedure for bioanalytical device applications

PubMed Central

Gao, Zhan; Henthorn, David B.; Kim, Chang-Soo

2009-01-01

In this work, we detail a method whereby a polymeric hydrogel layer is grafted to the negative tone photoresist SU-8 in order to improve its wettability. A photoinitiator is first immobilized on freshly prepared SU-8 samples, acting as the starting point for various surface modifications strategies. Grafting of a 2-hydroxyethylmethacrylate-based hydrogel from the SU-8 surface resulted in the reduction of the static contact angle of a water droplet from 79 ± 1° to 36 ± 1°, while addition of a poly(ethylene glycol)-rich hydrogel layer resulted in further improvement (8 ± 1°). Wettability is greatly enhanced after 30 minutes of polymerization, with a continued but more gradual decrease in contact angle up to approximately 50 minutes. Hydrogel formation is triggered by exposure to UV irradiation, allowing for the formation of photopatterned structures using existing photolithographic techniques. PMID:19756177

Maskless Lithography Using Negative Photoresist Material: Impact of UV Laser Intensity on the Cured Line Width

NASA Astrophysics Data System (ADS)

Mohammed, Mohammed Ziauddin; Mourad, Abdel-Hamid I.; Khashan, Saud A.

2018-06-01

The application of maskless lithography technique on negative photoresist material is investigated in this study. The equipment used in this work is designed and built especially for maskless lithography applications. The UV laser of 405 nm wavelength with 0.85 Numerical Aperture is selected for direct laser writing. All the samples are prepared on a glass substrate. Samples are tested at different UV laser intensities and different stage velocities in order to study the impact on patterned line width. Three cases of spin coated layers of thickness 90 μm, 40 μm, and 28 μm on the substrate are studied. The experimental results show that line width has a generally increasing trend with intensity. However, a decreasing trend was observed for increasing velocity. The overall performance shows that the mr-DWL material is suitable for direct laser writing systems.

Modified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists

NASA Astrophysics Data System (ADS)

Pawlowski, Georg; Sauer, Thomas P.; Dammel, Ralph R.; Gordon, Douglas J.; Hinsberg, William D.; McKean, Dennis R.; Lindley, Charlet R.; Merrem, Hans-Joachim; Roeschert, Heinz; Vicari, Richard; Willson, C. Grant

1990-06-01

It is generally accepted that the production of shrink versions of the 16 MB DRAM and the 64 MB DRAM generations will be patterned using deep UV radiation. This provides a new challenge to the photoresist suppliers, as the standard photoresist formulations are not suitable for this technology, mainly because the presently used novolak resins are highly opaque in the 200 - 300 nm region. This is especially true for the 248 nm wavelength of KrF eximer lasers. Poly 4- hydroxystyrene [PHS] has several advantages in transmission and thermal stability; however, its dissolution rate in commercial grade developers is unacceptably high. We report some recent results on modified, alkyl-substituted PHS derivatives. These polymers combine reduced alkaline solubiity with adequate optical and thermal properties, making them acceptable for future deep UV based production processes. Selected data of these new (co)polymers are discussed.

Trapping of vesicles on patterned surfaces by physisorption for potential biosensing applications.

PubMed

Bera, L K; Ong, Kian Soo; Wong, Zheng Zheng; Fu, Zhikang; Nallani, Madhavan; Shea, Sean O'

2012-01-01

The pre-defined selective positioning of a controlled number of vesicles on a rigid substrate is crucial in many potential applications such as diagnostics, biosensors, lab-on-a chip, microanalyses and reaction chambers. In this paper, the vesicles made up of block copolymer using Poly [-(2-methyloxazoline) -poly- (dimethylsiloxane)-poly- (2-methyloxazoline)] (ABA) with dimensions of 100-200 nm are trapped by physisorption on hydrophilic surfaces. We discuss the protocols established for vesicle trapping. The optimum conditions obtained for physisorption is 15 minutes incubation followed by one cycle of DI water rinse. Trapping of 1-10 vesicles in lobe shape micro-wells fabricated by photo lithography using photoresist on UltraStick(™) slides was demonstrated. To overcome the issue of amalgamation of emitted light from optically sensitive photoresist and fluorescently tagged vesicles, an alternative approach of Si/SiO(2) microwell array coupled with APTES (3-AminoPropylTriEthoxySilane) treated bottom surfaces was developed.

Simple Multi-level Microchannel Fabrication by Pseudo-Grayscale Backside Diffused Light Lithography.

PubMed

Lai, David; Labuz, Joseph M; Kim, Jiwon; Luker, Gary D; Shikanov, Ariella; Takayama, Shuichi

2013-11-14

Photolithography of multi-level channel features in microfluidics is laborious and/or costly. Grayscale photolithography is mostly used with positive photoresists and conventional front side exposure, but the grayscale masks needed are generally costly and positive photoresists are not commonly used in microfluidic rapid prototyping. Here we introduce a simple and inexpensive alternative that uses pseudo-grayscale (pGS) photomasks in combination with backside diffused light lithography (BDLL) and the commonly used negative photoresist, SU-8. BDLL can produce smooth multi-level channels of gradually changing heights without use of true grayscale masks because of the use of diffused light. Since the exposure is done through a glass slide, the photoresist is cross-linked from the substrate side up enabling well-defined and stable structures to be fabricated from even unspun photoresist layers. In addition to providing unique structures and capabilities, the method is compatible with the "garage microfluidics" concept of creating useful tools at low cost since pGS BDLL can be performed with the use of only hot plates and a UV transilluminator: equipment commonly found in biology labs. Expensive spin coaters or collimated UV aligners are not needed. To demonstrate the applicability of pGS BDLL, a variety of weir-type cell traps were constructed with a single UV exposure to separate cancer cells (MDA-MB-231, 10-15 μm in size) from red blood cells (RBCs, 2-8 μm in size) as well as follicle clusters (40-50 μm in size) from cancer cells (MDA-MB-231, 10-15 μm in size).

Development of AC-coupled, poly-silicon biased, p-on-n silicon strip detectors in India for HEP experiments

NASA Astrophysics Data System (ADS)

Jain, Geetika; Dalal, Ranjeet; Bhardwaj, Ashutosh; Ranjan, Kirti; Dierlamm, Alexander; Hartmann, Frank; Eber, Robert; Demarteau, Marcel

2018-02-01

P-on-n silicon strip sensors having multiple guard-ring structures have been developed for High Energy Physics applications. The study constitutes the optimization of the sensor design, and fabrication of AC-coupled, poly-silicon biased sensors of strip width of 30 μm and strip pitch of 55 μm. The silicon wafers used for the fabrication are of 4 inch n-type, having an average resistivity of 2-5 k Ω cm, with a thickness of 300 μm. The electrical characterization of these detectors comprises of: (a) global measurements of total leakage current, and backplane capacitance; (b) strip and voltage scans of strip leakage current, poly-silicon resistance, interstrip capacitance, interstrip resistance, coupling capacitance, and dielectric current; and (c) charge collection measurements using ALiBaVa setup. The results of the same are reported here.

Comic strips help children understand medical research: targeting the informed consent procedure to children's needs.

PubMed

Grootens-Wiegers, Petronella; de Vries, Martine C; van Beusekom, Mara M; van Dijck, Laura; van den Broek, Jos M

2015-04-01

Children involved in medical research often fail to comprehend essential research aspects. In order to improve information provision, a participatory approach was used to develop new information material explaining essential concepts of medical research. A draft of a comic strip was developed by a science communicator in collaboration with pediatricians. The draft was presented to children participating in a clinical trial and to two school classes. Children were consulted for further development in surveys and interviews. Subsequently, the material was revised and re-evaluated in four school classes with children of varying ages and educational levels. In the first evaluation, children provided feedback on the storyline, wording and layout. Children thought the comic strip was 'fun' and 'informative'. Understanding of 8 basic research aspects was on average 83% and all above 65%, illustrating that children understood and remembered key messages. A comic strip was developed to support the informed consent process. Children were consulted and provided feedback. The resulting material was well understood and accepted. Involving children in the development of information material can substantially contribute to the quality of the material. Children were excited to participate and to 'be a part of science'. Copyright © 2015 Elsevier Ireland Ltd. All rights reserved.

The effects of the Israeli siege on health provision in the Gaza Strip: a qualitative and theoretical analysis.

PubMed

Smith, Ron J

2018-02-21

Siege, a process of political domination aimed at isolating an entire population, is a unique threat to health-care provision. The aim of this study was to qualitatively examine the effects of the Israeli siege on the practices and systems that underlie health in the Gaza Strip. Data were from participant observation between 2009 and 2017, including 20 interviews with doctors and health administrators in non-governmental organisations (NGO), government, and UN sectors. All participants were provided with a description of the study and provided written consent to participate. The study was approved through the Human Subjects Review process at Bucknell University and the University of Washington. The data were analysed using a critical political economic framework, based on the concepts of primitive accumulation, accumulation by dispossession, surplus populations, and de-development. These analytical frames are further developed to interpret neoliberal trends in health-care systems organising and financing as they apply in the distorted social and economic context of siege. The elimination of political sovereignty through the twin processes of occupation and siege are the primary impediments to the successful promotion of public health in the Gaza Strip. Findings indicate that siege impinges on effective health-care provision by withholding materials and resources and undermining the health care at a systems level. These strains pose considerable threats to health care, within the ministry of health and among other entities in the Gaza Strip that deliver care. Gazan society is divested of the underpinnings necessary for a well functioning sovereign health-care infrastructure. Instead of a self-governing, independent system, this analysis reveals a system that is comprised of captive clients who are entirely dependent on Israel, international bodies, and the aid industry for goods and services, with no means of independent development. The siege represents a totalising social determinant of public health in the Gaza Strip, and it has significant and deliberate deleterious effects on the provision of medical care and exacerbates problems in overstretched medical services. These findings point to the importance of foregrounding the geopolitical context for analysis of medical service delivery within conflict settings. The data indicate formative trends in health-care provision in the Gaza Strip. Although the siege creates a seemingly unique economic context for analysis of health-care provision, critical analyses that deconstruct the depredations of neoliberalism in the health-care setting provide a useful framework for analysis of the failings of the health-care sector. Indeed, health-care providers are in an impossible position of attempting to provide quality care without the ability to coordinate with their colleagues in other sectors, and without substantial support from the international community. The final analysis also highlights the importance of advocating for sovereignty and self-determination as related to health systems, and it suggests that successful health-care provision is impossible without a strong analysis of the political and economic context. Bucknell University. Copyright © 2018 Elsevier Ltd. All rights reserved.

ASRM test report: Autoclave cure process development

NASA Technical Reports Server (NTRS)

Nachbar, D. L.; Mitchell, Suzanne

1992-01-01

ASRM insulated segments will be autoclave cured following insulation pre-form installation and strip wind operations. Following competitive bidding, Aerojet ASRM Division (AAD) Purchase Order 100142 was awarded to American Fuel Cell and Coated Fabrics Company, Inc. (Amfuel), Magnolia, AR, for subcontracted insulation autoclave cure process development. Autoclave cure process development test requirements were included in Task 3 of TM05514, Manufacturing Process Development Specification for Integrated Insulation Characterization and Stripwind Process Development. The test objective was to establish autoclave cure process parameters for ASRM insulated segments. Six tasks were completed to: (1) evaluate cure parameters that control acceptable vulcanization of ASRM Kevlar-filled EPDM insulation material; (2) identify first and second order impact parameters on the autoclave cure process; and (3) evaluate insulation material flow-out characteristics to support pre-form configuration design.

Phosphorus Segregation in Meta-Rapidly Solidified Carbon Steels

NASA Astrophysics Data System (ADS)

Li, Na; Qiao, Jun; Zhang, Junwei; Sha, Minghong; Li, Shengli

2017-09-01

Twin-roll strip casters for near-net-shape manufacture of steels have received increased attention in the steel industry. Although negative segregation of phosphorus occurred in twin-roll strip casting (TRSC) steels in our prior work, its mechanism is still unclear. In this work, V-shaped molds were designed and used to simulate a meta-rapid solidification process without roll separating force during twin roll casting of carbon steels. Experimental results show that no obvious phosphorus segregation exist in the V-shaped mold casting (VMC) steels. By comparing TRSC and the VMC, it is proposed that the negative phosphorus segregation during TRSC results from phosphorus redistribution driven by recirculating and vortex flow in the molten pool. Meanwhile, solute atoms near the advancing interface are overtaken and incorporated into the solid because of the high solidification speed. The high rolling force could promote the negative segregation of alloying elements in TRSC.

Results Of Routine Strip Effluent Hold Tank, Decontaminated Salt Solution Hold Tank, And Caustic Wash Tank Samples From Modular Caustic-Side Solvent Extraction Unit During Macrobatch 4 Operations

DOE Office of Scientific and Technical Information (OSTI.GOV)

Peters, T. B.; Fink, S. D.

Strip Effluent Hold Tank (SEHT), Decontaminated Salt Solution Hold Tank (DSSHT), and Caustic Wash Tank (CWT) samples from several of the ?microbatches? of Integrated Salt Disposition Project (ISDP) Salt Batch (?Macrobatch?) 4 have been analyzed for {sup 238}Pu, {sup 90}Sr, {sup 137}Cs, and by inductively-coupled plasma emission spectroscopy (ICPES). Furthermore, samples from the CWT have been analyzed by a variety of methods to investigate a decline in the decontamination factor (DF) of the cesium observed at MCU. The results indicate good decontamination performance within process design expectations. While the data set is sparse, the results of this set and themore » previous set of results for Macrobatch 3 samples indicate generally consistent operations. There is no indication of a disruption in plutonium and strontium removal. The average cesium DF and concentration factor (CF) for samples obtained from Macrobatch 4 are slightly lower than for Macrobatch 3, but still well within operating parameters. The DSSHT samples show continued presence of titanium, likely from leaching of the monosodium titanate in Actinide Removal Process (ARP).« less

Dynamics of spiral patterns in gas discharge detected by optical method

NASA Astrophysics Data System (ADS)

Yang, Fan; Wang, Mingyi; Liu, Shuhua

2016-09-01

The dynamics behavior of spiral patterns is investigated in gas discharge using optical method. Rich kinks of spiral patterns are obtained and the formation and evolution process is investigated. The process of pattern formation is breakdown -> hexagon -> bee comb-like -> strip -> spiral -> chaos. Spiral pattern always formed after the strip pattern. It is found that the temperature of the water electrodes plays an important role in the spiral patterns formation. When it exceeds 20°C no spiral has been obtained. The discharge current waveform and the emission spectrum of the discharge have been measured when the filaments self-organized in spiral pattern. Electron excited temperature of forming spiral pattern is calculated using intensity ratio method. It is found that the electron excited temperature of spiral pattern increase as the power supply frequency increased. Relation between wavelength and discharge parameter has been measured. It shows that the wavelength of spiral pattern increases as the discharge gap increases, and decreases as the air ratio mixed in argon increases. Accompanying measurements proved that the wavelength is approximately linear to the square root of the spiral rotating period .This work has useful reference value for studying pattern dynamics.

Dyed positive photoresist employing curcumin for notching control

DOE Office of Scientific and Technical Information (OSTI.GOV)

Renschler, C.L.; Lemen, E.K.; Rodriquez, J.L.

1989-01-01

A variety of dyes have been proposed as absorbers for photoresists. The nonbleachable absorbance incorporated in this way can result in a reduction in standing waves and/or reflective notching (nonuniform linewidths due to reflections off the substrate). In addition, it can provide increased visual contrast at the patterned resist inspection stage. A variation on the visual contrast improvement involves the use of a dye which fluoresces, allowing for more precise resist metrology. The deposition and growth processes used here result in large oxide and polycrystalline silicon steps with high aspect ratios. Processes such as LOCOS which allow less severe topography,more » are inherently radiation soft and cannot be used on our fabrication process. The resulting steep sidewalls make metal coverage and etch significantly more difficult. Thus, the glass layer which isolates metal conductors from oxide steps is smoothed with either a thermal reflow or a plasma etch of a partially planarized coating to reduce the aspect ratio of the step. This results in metal coverage with a 45{degrees} angle at each step, which causes severe notching. This paper reports on an attempt to develop a resist which would eliminate this notching problem. Although the addition of unbleachable dye to photoresist for the control of notching is well established, most of the dyes used have one or more serious shortcomings, such as a poor match of the absorption spectrum with the exposure spectrum or low solubility in resist. Severe notching requires the use of a resist dye with optimized physical and spectroscopic properties to allow high optical absorbance to be achieved without the onset of other problems such as particulate formation or changes in thermal properties.« less

ERTS-1 data applied to strip mining

NASA Technical Reports Server (NTRS)

Anderson, A. T.; Schubert, J.

1976-01-01

Two coal basins within the western region of the Potomac River Basin contain the largest strip-mining operations in western Maryland and West Virginia. The disturbed strip-mine areas were delineated along with the surrounding geological and vegetation features by using ERTS-1 data in both analog and digital form. The two digital systems employed were (1) the ERTS analysis system, a point-by-point digital analysis of spectral signatures based on known spectral values and (2) the LARS automatic data processing system. These two systems aided in efforts to determine the extent and state of strip mining in this region. Aircraft data, ground-verification information, and geological field studies also aided in the application of ERTS-1 imagery to perform an integrated analysis that assessed the adverse effects of strip mining. The results indicated that ERTS can both monitor and map the extent of strip mining to determine immediately the acreage affected and to indicate where future reclamation and revegetation may be necessary.

Inviscid, nonadiabatic flow fields over blunt, sonic corner bodies for outer planet entry conditions by a method of integral relations

NASA Technical Reports Server (NTRS)

Gnoffo, P. A.

1978-01-01

An investigation has been made into the ability of a method of integral relations to calculate inviscid zero degree angle of attack, radiative heating distributions over blunt, sonic corner bodies for some representative outer planet entry conditions is investigated. Comparisons have been made with a more detailed numerical method, a time asymptotic technique, using the same equilibrium chemistry and radiation transport subroutines. An effort to produce a second order approximation (two-strip) method of integral relations code to aid in this investigation is also described and a modified two-strip routine is presented. Results indicate that the one-strip method of integral relations cannot be used to obtain accurate estimates of the radiative heating distribution because of its inability to resolve thermal gradients near the wall. The two-strip method can sometimes be used to improve these estimates; however, the two-strip method has only a small range of conditions over which it will yield significant improvement over the one-strip method.

A feasibility study of a PET/MRI insert detector using strip-line and waveform sampling data acquisition.

PubMed

Kim, H; Chen, C-T; Eclov, N; Ronzhin, A; Murat, P; Ramberg, E; Los, S; Wyrwicz, Alice M; Li, Limin; Kao, C-M

2015-06-01

We are developing a time-of-flight Positron Emission Tomography (PET) detector by using silicon photo-multipliers (SiPM) on a strip-line and high speed waveform sampling data acquisition. In this design, multiple SiPMs are connected on a single strip-line and signal waveforms on the strip-line are sampled at two ends of the strip to reduce readout channels while fully exploiting the fast time response of SiPMs. In addition to the deposited energy and time information, the position of the hit SiPM along the strip-line is determined by the arrival time difference of the waveform. Due to the insensitivity of the SiPMs to magnetic fields and the compact front-end electronics, the detector approach is highly attractive for developing a PET insert system for a magnetic resonance imaging (MRI) scanner to provide simultaneous PET/MR imaging. To investigate the feasibility, experimental tests using prototype detector modules have been conducted inside a 9.4 Tesla small animal MRI scanner (Bruker BioSpec 94/30 imaging spectrometer). On the prototype strip-line board, 16 SiPMs (5.2 mm pitch) are installed on two strip-lines and coupled to 2 × 8 LYSO scintillators (5.0 × 5.0 × 10.0 mm 3 with 5.2 mm pitch). The outputs of the strip-line boards are connected to a Domino-Ring-Sampler (DRS4) evaluation board for waveform sampling. Preliminary experimental results show that the effect of interference on the MRI image due to the PET detector is negligible and that PET detector performance is comparable with the results measured outside the MRI scanner.

β-decay spectroscopy for the r-process nucleosynthesis

DOE Office of Scientific and Technical Information (OSTI.GOV)

Nishimura, Shunji; Collaboration: RIBF Decay Collaborations

2014-05-09

Series of decay spectroscopy experiments, utilizing of high-purity Ge detectors and double-sided silicon-strip detectors, have been conducted to harvest the decay properties of very exotic nuclei relevant to the r-process nucleosynthesis at the RIBF. The decay properties such as β-decay half-lives, low-lying states, β-delayed neutron emissions, isomeric states, and possibly Q{sub β} of the very neutron-rich nuclei are to be measured to give significant constraints in the uncertainties of nuclear properties for the r-process nucleosynthesis. Recent results of βγ spectroscopy study using in-flight fission of {sup 238}U-beam will be presented together with our future perspectives.

Sample Results From The Extraction, Scrub, And Strip Test For The Blended NGS Solvent

DOE Office of Scientific and Technical Information (OSTI.GOV)

Washington, A. L. II; Peters, T. B.

This report summarizes the results of the extraction, scrub, and strip testing for the September 2013 sampling of the Next Generation Solvent (NGS) Blended solvent from the Modular Caustic Side-Solvent Extraction Unit (MCU) Solvent Hold Tank. MCU is in the process of transitioning from the BOBCalixC6 solvent to the NGS Blend solvent. As part of that transition, MCU has intentionally created a blended solvent to be processed using the Salt Batch program. This sample represents the first sample received from that blended solvent. There were two ESS tests performed where NGS blended solvent performance was assessed using either the Tankmore » 21 material utilized in the Salt Batch 7 analyses or a simulant waste material used in the V-5/V-10 contactor testing. This report tabulates the temperature corrected cesium distribution, or D Cs values, step recovery percentage, and actual temperatures recorded during the experiment. This report also identifies the sample receipt date, preparation method, and analysis performed in the accumulation of the listed values. The calculated extraction D Cs values using the Tank 21H material and simulant are 59.4 and 53.8, respectively. The DCs values for two scrub and three strip processes for the Tank 21 material are 4.58, 2.91, 0.00184, 0.0252, and 0.00575, respectively. The D-values for two scrub and three strip processes for the simulant are 3.47, 2.18, 0.00468, 0.00057, and 0.00572, respectively. These values are similar to previous measurements of Salt Batch 7 feed with lab-prepared blended solvent. These numbers are considered compatible to allow simulant testing to be completed in place of actual waste due to the limited availability of feed material.« less

75 FR 49902 - Polyethylene Terephthalate Film, Sheet, and Strip From Taiwan: Preliminary Results of Antidumping...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-08-16

... Film, Sheet, and Strip From Taiwan: Preliminary Results of Antidumping Duty Administrative Review... antidumping duty order on polyethylene terephthalate film, sheet, and strip (PET Film) from Taiwan. This...), producers and exporters of PET Film from Taiwan. The Department preliminarily determines that sales of PET...

76 FR 18156 - Polyethylene Terephthalate Film, Sheet and Strip From India: Extension of Time Limit for...

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2011-04-01

... DEPARTMENT OF COMMERCE International Trade Administration [C-533-825] Polyethylene Terephthalate Film, Sheet and Strip From India: Extension of Time Limit for Preliminary Results of Countervailing... countervailing duty order on polyethylene terephthalate film, sheet and strip from India covering the period...

76 FR 47540 - Polyethylene Terephthalate Film, Sheet, and Strip From Taiwan: Preliminary Results of Antidumping...

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2011-08-05

... Film, Sheet, and Strip From Taiwan: Preliminary Results of Antidumping Duty Administrative Review... on polyethylene terephthalate film, sheet, and strip (PET Film) from Taiwan. The [[Page 47541..., Shinkong), and Nan Ya Plastics Corporation, Ltd. (Nan Ya), producers and exporters of PET Film from Taiwan...

78 FR 48147 - Polyethylene Terephthalate Film, Sheet, and Strip From India: Preliminary Results of...

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2013-08-07

... Film, Sheet, and Strip From India: Preliminary Results of Countervailing Duty Administrative Review... countervailing duty (CVD) order on polyethylene terephthalate film, sheet and strip (PET film) from India for the..., the products covered are all gauges of raw, pretreated, or primed polyethylene terephthalate film...

Investigation of premature strip seal joint failures and recommendations for assuring proper strip seal joint installation: Bridge 5/104W.

DOT National Transportation Integrated Search

2015-08-01

This document summarizes an investigation that was performed to identify the cause(s) of premature failures of : strip seal expansion joints that were installed on WSDOT Bridge No. 5/104W. The document also includes recommendations : for assuring pro...

76 FR 30910 - Polyethylene Terephthalate Film, Sheet, and Strip From India: Final Results of Countervailing...

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2011-05-27

... Film, Sheet, and Strip From India: Final Results of Countervailing Duty New Shipper Review AGENCY... shipper review of polyethylene terephthalate film, sheet and strip (PET Film) from India for SRF Limited...-1398. SUPPLEMENTARY INFORMATION: Background Since the issuance of Polyethylene Terephthalate Film...

77 FR 9892 - Polyethylene Terephthalate Film, Sheet and Strip from India: Preliminary Intent to Rescind...

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2012-02-21

... Film, Sheet and Strip from India: Preliminary Intent to Rescind Countervailing Duty Administrative... the countervailing duty (CVD) order on polyethylene terephthalate film, sheet and strip from India...), Jindal Poly Films Limited of India (Jindal), Polyplex Corporation Ltd. (Polyplex), and SRF Limited (SRF...

Electrode/Dielectric Strip For High-Energy-Density Capacitor

NASA Technical Reports Server (NTRS)

Yen, Shiao-Ping S.

1994-01-01

Improved unitary electrode/dielectric strip serves as winding in high-energy-density capacitor in pulsed power supply. Offers combination of qualities essential for high energy density: high permittivity of dielectric layers, thinness, and high resistance to breakdown of dielectric at high electric fields. Capacitors with strip material not impregnated with liquid.

Evaluation of radio-tracking and strip transect methods for determining foraging ranges of Black-Legged Kittiwakes

USGS Publications Warehouse

Ostrand, William D.; Drew, G.S.; Suryan, R.M.; McDonald, L.L.

1998-01-01

We compared strip transect and radio-tracking methods of determining foraging range of Black-legged Kittiwakes (Rissa tridactyla). The mean distance birds were observed from their colony determined by radio-tracking was significantly greater than the mean value calculated from strip transects. We determined that this difference was due to two sources of bias: (1) as distance from the colony increased, the area of available habitat also increased resulting in decreasing bird densities (bird spreading). Consequently, the probability of detecting birds during transect surveys also would decrease as distance from the colony increased, and (2) the maximum distance birds were observed from the colony during radio-tracking exceeded the extent of the strip transect survey. We compared the observed number of birds seen on the strip transect survey to the predictions of a model of the decreasing probability of detection due to bird spreading. Strip transect data were significantly different from modeled data; however, the field data were consistently equal to or below the model predictions, indicating a general conformity to the concept of declining detection at increasing distance. We conclude that radio-tracking data gave a more representative indication of foraging distances than did strip transect sampling. Previous studies of seabirds that have used strip transect sampling without accounting for bird spreading or the effects of study-area limitations probably underestimated foraging range.

75 FR 49893 - Polyethylene Terephthalate Film, Sheet, and Strip From the People's Republic of China...

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2010-08-16

... Film, Sheet, and Strip From the People's Republic of China: Preliminary Results and Preliminary... antidumping duty order on polyethylene terephthalate film, sheet, and strip (``PET film'') from the People's... Teijin Films, Mitsubishi Polyester Film, Inc., SKC, Inc., and Toray Plastics (America), Inc...

77 FR 1668 - Polyethylene Terephthalate Film, Sheet and Strip From India: Rescission, in Part, of...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-01-11

... Film, Sheet and Strip From India: Rescission, in Part, of Countervailing Duty Administrative Review... (CVD) order on polyethylene terephthalate film, sheet and strip from India covering the period January... companies: Ester Industries Limited (Ester), Garware Polyester Ltd. (Garware), Jindal Poly Films Limited of...

77 FR 19634 - Polyethylene Terephthalate Film, Sheet and Strip From India: Rescission of Countervailing Duty...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-04-02

... Film, Sheet and Strip From India: Rescission of Countervailing Duty Administrative Review AGENCY... (CVD) order on polyethylene terephthalate film, sheet and strip from India covering the period January... companies: Ester Industries Limited (Ester), Garware Polyester Ltd. (Garware), Jindal Poly Films Limited of...

78 FR 48651 - Polyethylene Terephthalate Film, Sheet, and Strip From Taiwan; Preliminary Results of Antidumping...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-08-09

... Film, Sheet, and Strip From Taiwan; Preliminary Results of Antidumping Duty Administrative Review; 2011... duty order on polyethylene terephthalate film, sheet, and strip (PET Film) from Taiwan. The period of.... (SMTC) (collectively, Shinkong), producer and exporter of PET Film from Taiwan. The Department...

78 FR 50029 - Polyethylene Terephthalate Film, Sheet and Strip From Brazil: Preliminary Results of Antidumping...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-08-16

... Film, Sheet and Strip From Brazil: Preliminary Results of Antidumping Duty Administrative Review; 2011...Pont Teijin Films, Mitsubishi Polyester Film, Inc., SKC, Inc., and Toray Plastics (America), Inc... the antidumping duty order on polyethylene terephthalate film, sheet and strip (PET film) from Brazil...

Mechanical Computing in Microelectromechanical Systems (MEMS)

DTIC Science & Technology

2003-03-01

New York: John Wiley and Sons, Inc., 1968. 25. Helvajian , H . and S. Janson, Microengineering Aerospace Systems, ch. Micro- engineering Space Systems...sacrificial layer. (g)Strip remaining resist. ( h ) Deposit a structural layer(conformal deposition is shown). (i) Deposit resist. (j) Expose resist...layer is then deposited, and assuming a conformal process, the structural layer will follow the topography of the sacrificial layer (Figure 2.9( h

Buffer strip design for protecting water quality and fish habitat

DOE Office of Scientific and Technical Information (OSTI.GOV)

Belt, G.H.; O'Laughlin, J.

1994-04-01

Buffer strips are protective areas adjacent to streams or lakes. Among other functions, they protect water quality and fish habitat. A typical buffer strip is found in western Oregon, where they are called Riparian Management Areas (RMAs). The authors use the term buffer strip to include functional descriptions such as filter, stabilization, or leave strips, and administrative designations such as Idaho's Stream Protection Zone (SPZ), Washington's Riparian Management Zone (RMZ), and the USDA Forest Service's Streamside Management Zone (SMZ). They address water quality and fishery protective functions of buffer strips on forestlands, pointing out improvements in buffer strip design possiblemore » through research or administrative changes. Buffer strip design requirements found in some western Forest Practices Act (FPA) regulations are also compared and related to findings in the scientific literature.« less

Bilayer lift-off process for aluminum metallization

NASA Astrophysics Data System (ADS)

Wilson, Thomas E.; Korolev, Konstantin A.; Crow, Nathaniel A.

2015-01-01

Recently published reports in the literature for bilayer lift-off processes have described recipes for the patterning of metals that have recommended metal-ion-free developers, which do etch aluminum. We report the first measurement of the dissolution rate of a commercial lift-off resist (LOR) in a sodium-based buffered commercial developer that does not etch aluminum. We describe a reliable lift-off recipe that is safe for multiple process steps in patterning thin (<100 nm) and thick aluminum devices with micron-feature sizes. Our patterning recipe consists of an acid cleaning of the substrate, the bilayer (positive photoresist/LOR) deposition and development, the sputtering of the aluminum film along with a palladium capping layer and finally, the lift-off of the metal film by immersion in the LOR solvent. The insertion into the recipe of postexposure and sequential develop-bake-develop process steps are necessary for an acceptable undercut. Our recipe also eliminates any need for accompanying sonication during lift-off that could lead to delamination of the metal pattern from the substrate. Fine patterns were achieved for both 100-nm-thick granular aluminum/palladium bilayer bolometers and 500-nm-thick aluminum gratings with 6-μm lines and 4-μm spaces.

Comparing reliabilities of strip and conventional patch testing.

PubMed

Dickel, Heinrich; Geier, Johannes; Kreft, Burkhard; Pfützner, Wolfgang; Kuss, Oliver

2017-06-01

The standardized protocol for performing the strip patch test has proven to be valid, but evidence on its reliability is still missing. To estimate the parallel-test reliability of the strip patch test as compared with the conventional patch test. In this multicentre, prospective, randomized, investigator-blinded reliability study, 132 subjects were enrolled. Simultaneous duplicate strip and conventional patch tests were performed with the Finn Chambers ® on Scanpor ® tape test system and the patch test preparations nickel sulfate 5% pet., potassium dichromate 0.5% pet., and lanolin alcohol 30% pet. Reliability was estimated by the use of Cohen's kappa coefficient. Parallel-test reliability values of the three standard patch test preparations turned out to be acceptable, with slight advantages for the strip patch test. The differences in reliability were 9% (95%CI: -8% to 26%) for nickel sulfate and 23% (95%CI: -16% to 63%) for potassium dichromate, both favouring the strip patch test. The standardized strip patch test method for the detection of allergic contact sensitization in patients with suspected allergic contact dermatitis is reliable. Its application in routine clinical practice can be recommended, especially if the conventional patch test result is presumably false negative. © 2017 John Wiley & Sons A/S. Published by John Wiley & Sons Ltd.

Extraction, scrub, and strip test results for the salt waste processing facility caustic side solvent extraction solvent example

DOE Office of Scientific and Technical Information (OSTI.GOV)

Peters, T. B.

An Extraction, Scrub, and Strip (ESS) test was performed on a sample of Salt Waste Processing Facility (SWPF) Caustic-Side Solvent Extraction (CSSX) solvent and salt simulant to determine cesium distribution ratios (D(Cs)), and cesium concentration in the strip effluent (SE) and decontaminated salt solution (DSS) streams; this data will be used by Parsons to help determine if the solvent is qualified for use at the SWPF. The ESS test showed acceptable performance of the solvent for extraction, scrub, and strip operations. The extraction D(Cs) measured 12.9, exceeding the required value of 8. This value is consistent with results from previousmore » ESS tests using similar solvent formulations. Similarly, scrub and strip cesium distribution ratios fell within acceptable ranges.« less

Silicon micro-mold

DOEpatents

Morales, Alfredo M [Livermore, CA

2006-10-24

The present invention describes a method for rapidly fabricating a robust 3-dimensional silicon-mold for use in preparing complex metal micro-components. The process begins by depositing a conductive metal layer onto one surface of a silicon wafer. A thin photoresist and a standard lithographic mask are then used to transfer a trace image pattern onto the opposite surface of the wafer by exposing and developing the resist. The exposed portion of the silicon substrate is anisotropically etched through the wafer thickness down to conductive metal layer to provide an etched pattern consisting of a series of rectilinear channels and recesses in the silicon which serve as the silicon micro-mold. Microcomponents are prepared with this mold by first filling the mold channels and recesses with a metal deposit, typically by electroplating, and then removing the silicon micro-mold by chemical etching.

75 FR 10758 - Polyethylene Terephthalate Film, Sheet and Strip from India: Initiation of Antidumping Duty and...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-03-09

... Terephthalate Film, Sheet and Strip from India: Initiation of Antidumping Duty and Countervailing Duty New... of the antidumping (AD) and countervailing duty (CVD) orders on Polyethylene Terephthalate Film, Sheet and Strip (PET Film) from India. The Department determines that these requests are sufficient to...

75 FR 80457 - Polyethylene Terephthalate Film, Sheet and Strip From India: Extension of Time Limit for...

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2010-12-22

... Film, Sheet and Strip From India: Extension of Time Limit for Preliminary Results of Antidumping Duty... review of the antidumping duty order on polyethylene terephthalate film, sheet and strip from India for the period July 1, 2009, through December 31, 2009. See Polyethylene Terephthalate Film, Sheet and...

76 FR 22867 - Polyethylene Terephthalate Film, Sheet, and Strip From the United Arab Emirates: Final Results of...

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2011-04-25

... Film, Sheet, and Strip From the United Arab Emirates: Final Results of Antidumping Duty Administrative... of administrative review of the antidumping duty order on polyethylene terephthalate film (PET Film... Polyethylene Terephthalate Film, Sheet, and Strip From the United Arab Emirates: Preliminary Results of...

76 FR 45508 - Polyethylene Terephthalate Film, Sheet and Strip From the United Arab Emirates: Extension of Time...

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2011-07-29

... DEPARTMENT OF COMMERCE International Trade Administration [A-520-803] Polyethylene Terephthalate Film, Sheet and Strip From the United Arab Emirates: Extension of Time Limit for Preliminary Results of... polyethylene terephthalate film, sheet and strip from the United Arab Emirates (UAE) for the period November 01...

76 FR 57715 - Polyethylene Terephthalate Film, Sheet, and Strip From the Republic of Korea: Revocation of...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-09-16

... Film, Sheet, and Strip From the Republic of Korea: Revocation of Antidumping Duty Order AGENCY: Import... polyethylene terephthalate film, sheet, and strip (PET film) from the Republic of Korea. Pursuant to section...) determined that revocation of the existing antidumping duty order on polyethylene terephthalate film, sheet...

77 FR 20357 - Polyethylene Terephthalate Film, Sheet, and Strip From the United Arab Emirates: Final Results of...

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2012-04-04

... Film, Sheet, and Strip From the United Arab Emirates: Final Results of Antidumping Duty Administrative... administrative review of the antidumping duty order on polyethylene terephthalate film (PET Film) from the United.... \\1\\ See Polyethylene Terephthalate Film, Sheet, and Strip from the United Arab Emirates: Preliminary...

76 FR 42681 - Brass Sheet and Strip From Germany: Notice of Rescission of Antidumping Duty Administrative Review

Federal Register 2010, 2011, 2012, 2013, 2014

2011-07-19

... Germany: Notice of Rescission of Antidumping Duty Administrative Review AGENCY: Import Administration... antidumping duty order on brass sheet and strip from Germany. The review covers one producer/exporter of brass sheet and strip from Germany, Wieland-Werke AG (``Wieland''). Based on a timely withdrawal of the...

77 FR 32507 - Brass Sheet and Strip From Germany: Notice of Rescission of Antidumping Duty Administrative Review

Federal Register 2010, 2011, 2012, 2013, 2014

2012-06-01

... Germany: Notice of Rescission of Antidumping Duty Administrative Review AGENCY: Import Administration... and strip from Germany for the period of review (``POR''), March 1, 2011, through February 29, 2012.\\1... brass sheet and strip from Germany: Aurubis Stolberg GmbH & Co. KG (``Aurubis''), Carl Schreiber GmbH...

Technical performance of lactate biosensors and a test-strip device during labour.

PubMed

Luttkus, A K; Fotopoulou, C; Sehouli, J; Stupin, J; Dudenhausen, J W

2010-04-01

Lactate in fetal blood has a high diagnostic power to detect fetal compromise due to hypoxia, as lactate allows an estimation of duration and intensity of metabolic acidemia. Biosensor technology allows an instantaneous diagnosis of fetal compromise in the delivery room. The goal of the current investigation is to define the preanalytical and analytical biases of this technology under routine conditions in a labour ward in comparison to test-strip technology, which allows measurement of lactate alone. Three lactate biosensors (RapidLab 865, Siemens Medical Solutions Diagnostics, Bad Nauheim, Germany; Radiometer ABL625 and ABL 700, Radiometer Copenhagen, Denmark) and one test-strip device (Lactate Pro, Oxford Instruments, UK) were evaluated regarding precision in serial and repetitive measurements in over 1350 samples of fetal whole blood. The coefficient of variation (CV) and the standard deviation (SD) were calculated. The average value of all three biosensors was defined as an artificial reference value (refval). Blood tonometry was performed in order to test the quality of respiratory parameters and to simulate conditions of fetal hypoxia (pO (2): 10 and 20 mmHg). The precision of serial measurements of all biosensors indicated a coefficient of variation (CV) between 1.55 and 3.16% with an SD from 0.042 to 0.053 mmol/L. The test-strip device (Lactate Pro) mounted to 0.117 mmol/L and 3.99% (SD, CV). When compared to our reference value (refval) ABL 625 showed the closest correlation of -0.1%, while Siemens RapidLab 865 showed an overestimation of +8.9%, ABL700 an underestimation of -6.2% and Lactate Pro of -3.7%. For routine use all tested biosensors show sufficient precision. The test-strip device shows a slightly higher standard deviation. A direct comparison of measured lactate values from the various devices needs to be interpreted with caution as each method detects different lactate concentrations. Furthermore, the 40 min process of tonometry led to an increase of SD and coefficient of variation in all devices. This results in the important preanalytical finding that the precision of replicated measurements worsens significantly with time. The clinician should be aware of the type of analyser used and of preanalytical biases before making clinical decisions on the basis of lactate values.

Verification and extension of the MBL technique for photo resist pattern shape measurement

NASA Astrophysics Data System (ADS)

Isawa, Miki; Tanaka, Maki; Kazumi, Hideyuki; Shishido, Chie; Hamamatsu, Akira; Hasegawa, Norio; De Bisschop, Peter; Laidler, David; Leray, Philippe; Cheng, Shaunee

2011-03-01

In order to achieve pattern shape measurement with CD-SEM, the Model Based Library (MBL) technique is in the process of development. In this study, several libraries which consisted by double trapezoid model placed in optimum layout, were used to measure the various layout patterns. In order to verify the accuracy of the MBL photoresist pattern shape measurement, CDAFM measurements were carried out as a reference metrology. Both results were compared to each other, and we confirmed that there is a linear correlation between them. After that, to expand the application field of the MBL technique, it was applied to end-of-line (EOL) shape measurement to show the capability. Finally, we confirmed the possibility that the MBL could be applied to more local area shape measurement like hot-spot analysis.

The role of heat transfer in strip casting

NASA Astrophysics Data System (ADS)

Misra, Paretosh

The last few years have witnessed rapid developments in the area of strip casting of steel. It involves smaller capital and operating cost, lower greenhouse gas emissions, and an opportunity to create newer products due to a faster solidification rate that leads to a different solidification structure. Thus, ample reasons for interest in the technology exist. At the same time, it needs to be determined if the properties of a strip cast product can match those of a conventional product and if it is possible to produce steel strip at high production rates. The first objective of this work was to characterize the quality, structure, and properties of strip cast material of different chemistries and cast at different machines, to identify the critical operating conditions that would result in the best properties. Determination of the possible range of properties was also aimed, given that the structure of the material is different from the traditional material. The second objective was to investigate ways to increase the rate of heat transfer in strip casting, as that will also enhance the productivity of a strip caster. It was also envisaged to see what effect a high rate of heat transfer will have on the properties of the strip cast material. Results from the strip cast material characterization that was carried out to achieve the first objective indicated that an effective control of heat transfer is very important to get the best properties. Samples that showed best properties had a uniform solidification structure consisting of columnar grains running from the edge of a strip to the centerline, indicating a good control of heat transfer, and their dendrite spacings pointed towards a relatively faster rate of cooling between the rolls. These findings indicated that heat transfer is a core issue in strip casting. The mechanism of increase in the rate of heat transfer in strip casting due to the presence of liquid oxide films at the metal-mold interface was examined. It was discovered that these films originate from the metal itself. A high degree of interdendritic supersaturation can lead to the formation of low melting point oxide phases by the deoxidizing agents in the steel. As the temperature lowers further the film may get ejected out of the metal due to the non-wetting of the metal by the oxide phase. If enough oxide film can be generated then this can result in an almost two-fold increase in the rate of heat transfer during initial solidification---the first 20 milliseconds. The results indicate that if a proper control of these films is ensured then it provides an attractive alternative to increasing the roll diameter as a mechanism of increasing the rate of production of a strip caster. This mechanism will work even with smaller diameter rolls, in fact, perhaps better in that case due to a smaller interface area over which uniformity of heat transfer has to be ensured, thus leveraging its full advantages. If successfully implemented at a plant, this technique can help the strip casting machines to increase their productivity and emerge as a competitive technology to produce steel strip.

76 FR 18155 - Polyethylene Terephthalate Film, Sheet and Strip From India: Extension of Time Limit for...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-04-01

... DEPARTMENT OF COMMERCE International Trade Administration [A-533-824] Polyethylene Terephthalate Film, Sheet and Strip From India: Extension of Time Limit for Preliminary Results of Antidumping Duty... polyethylene terephthalate film, sheet and strip from India covering the period July 1, 2009, through June 30...

76 FR 40325 - Polyethylene Terephthalate Film, Sheet, and Strip From the Republic of Korea: Preliminary Results...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-07-08

... Film, Sheet, and Strip From the Republic of Korea: Preliminary Results of Antidumping Duty... antidumping duty order on polyethylene terephthalate film, sheet and strip (PET film) from the Republic of... antidumping duty order on PET film from Korea. See Antidumping or Countervailing Duty Order, Finding, or...

76 FR 61085 - Polyethylene Terephthalate Film, Sheet, and Strip From the People's Republic of China: Extension...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-10-03

... Film, Sheet, and Strip From the People's Republic of China: Extension of Preliminary Results of... for the preliminary results of the administrative review of polyethylene terephthalate film, sheet, and strip (``PET film'') from the People's Republic of China (``PRC''). This review covers the period...

76 FR 72676 - Polyethylene Terephthalate Film, Sheet, and Strip From Brazil: Final Results of Antidumping Duty...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-11-25

... Film, Sheet, and Strip From Brazil: Final Results of Antidumping Duty Administrative Review AGENCY... administrative review of the antidumping duty order on polyethylene terephthalate film, sheet, and strip (PET film) from Brazil for the period November 1, 2009 through October 31, 2010. We gave interested parties...

76 FR 76365 - Polyethylene Terephthalate Film, Sheet, and Strip From the United Arab Emirates: Preliminary...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-12-07

... Film, Sheet, and Strip From the United Arab Emirates: Preliminary Results of Antidumping Duty... antidumping duty order on polyethylene terephthalate film, sheet, and strip (PET Film) from the United Arab Emirates (UAE). This review covers the respondent, JBF RAK LLC (JBF), a producer and exporter of PET Film...

76 FR 76943 - Polyethylene Terephthalate Film, Sheet, and Strip From India: Final Results of Antidumping Duty...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-12-09

... Film, Sheet, and Strip From India: Final Results of Antidumping Duty Administrative Review AGENCY... review of the antidumping duty order on polyethylene terephthalate film (PET Film) from India.\\1\\ This...'' section below. \\1\\ See Polyethylene Terephthalate Film, Sheet, and Strip From India: Preliminary Results...

78 FR 2365 - Polyethylene Terephthalate Film, Sheet and Strip From India: Partial Rescission of Antidumping...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-01-11

... Film, Sheet and Strip From India: Partial Rescission of Antidumping Duty Administrative Review; 2011...) order on polyethylene terephthalate film, sheet and strip from India covering the period July 1, 2011...), Polyplex Corporation Ltd. (Polyplex), SRF Limited (SRF), and Jindal Poly Films Limited of India (Jindal).\\3...

78 FR 48143 - Polyethylene Terephthalate Film, Sheet, and Strip From India: Preliminary Results of Antidumping...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-08-07

... Film, Sheet, and Strip From India: Preliminary Results of Antidumping Duty Administrative Review; 2011... duty order on polyethylene terephthalate film, sheet, and strip (PET Film) from India. The period of... Films Limited (Jindal), SRF Limited (SRF), and Polyplex Corporation Ltd. (Polyplex). Jindal and SRF were...

78 FR 67113 - Polyethylene Terephthalate Film, Sheet and Strip From India and Taiwan: Preliminary Results of...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-11-08

... Terephthalate Film, Sheet and Strip From India and Taiwan: Preliminary Results of the Second Sunset Review of... antidumping duty orders on Polyethylene Terephthalate Film, Sheet and Strip (``PET Film'') from India and...) 482-2371, respectively. SUPPLEMENTARY INFORMATION: Background The antidumping duty orders on PET Film...

78 FR 77649 - Polyethylene Terephthalate Film, Sheet, and Strip From the United Arab Emirates; Preliminary...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-12-24

... Film, Sheet, and Strip From the United Arab Emirates; Preliminary Results of Antidumping Duty... film, sheet, and strip (PET Film) from the United Arab Emirates (UAE). The period of review (POR) is... covered by the order are all gauges of raw, pre- treated, or primed polyethylene terephthalate film...

Strip cutting in northern hardwoods

Treesearch

Richard M. Godman

1992-01-01

Interest in clearcutting young northern hardwood stands in strips is running high, especially now that mechanical fellers and skidders have been developed to harvest these stands. Strip cutting has several advantages-no overstory to worry about when treating the site, no overstory to remove later, and the economic advantage of cutting the strip only once.

75 FR 75172 - Polyethylene Terephthalate Film, Sheet, and Strip From Brazil: Final Results of Antidumping Duty...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-12-02

... Film, Sheet, and Strip From Brazil: Final Results of Antidumping Duty Administrative Review AGENCY... administrative review of the antidumping duty order on polyethylene terephthalate film, sheet, and strip (PET film) from Brazil for the period November 6, 2008, through October 31, 2009. We gave interested parties...

75 FR 81570 - Polyethylene Terephthalate Film, Sheet, and Strip From India: Preliminary Results of Antidumping...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-12-28

... Film, Sheet, and Strip From India: Preliminary Results of Antidumping Duty New Shipper Review AGENCY... antidumping duty order on polyethylene terephthalate film, sheet, and strip (PET film) from India in response... Teijin Films, Mitsubishi Polyester Film, Inc., SKC, Inc. and Toray Plastics (America), Inc. (petitioners...

76 FR 47546 - Polyethylene Terephthalate Film, Sheet, and Strip From India: Preliminary Results of Antidumping...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-08-05

... Film, Sheet, and Strip From India: Preliminary Results of Antidumping Duty Administrative Review AGENCY... on polyethylene terephthalate film, sheet, and strip (PET Film) from India. This review covers one respondent, Ester Industries Ltd. (Ester), a producer and exporter of PET Film from India. The Department...

77 FR 3730 - Polyethylene Terephthalate Film, Sheet and Strip From India: Rescission, in Part, of Antidumping...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-01-25

... Film, Sheet and Strip From India: Rescission, in Part, of Antidumping Duty Administrative Review AGENCY... polyethylene terephthalate film, sheet and strip from India covering the period July 1, 2010, through June 30...), Garware Polyester Ltd. (Garware), Jindal Poly Films Limited of India (Jindal), Polyplex [[Page 3731...

77 FR 73010 - Polyethylene Terephthalate Film, Sheet, and Strip From the United Arab Emirates; Preliminary...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-12-07

... Film, Sheet, and Strip From the United Arab Emirates; Preliminary Results of Antidumping Duty... the antidumping duty order on polyethylene terephthalate film, sheet, and strip (PET Film) from the... covered by the order are all gauges of raw, pre- treated, or primed polyethylene terephthalate film...

[Effects of reduced N application rate on yield and nutrient uptake and utilization in maize-soybean relay strip intercropping system].

PubMed

Yong, Tai-Wen; Liu, Xiao-Ming; Wen-Yu, Liu; Su, Ben-Ying; Song, Chun; Yang, Feng; Wang, Xiao-Chun; Yang, Wen-Yu

2014-02-01

A field experiment with three N application rates (0, 180, 240 N kg x hm(-2), representing zero, reduced and conventional N application, respectively) and three planting patterns (maize monoculture, soybean monoculture and maize-soybean relay strip intercropping) was conducted to reveal the effects of cropping patterns and N application rates on yield, nutrient uptake and nitrogen use efficiency of maize and soybean. The results showed that the grain yield, N, P and K uptake and harvest index of the intercropped maize reduced slightly compared with the monoculture maize, however these indices of the intercropped soybean increased significantly compared with the monoculture. With the increase in nitrogen fertilizer application, the excellence of relay strip intercropping was weakened in the maize-soybean intercropping system. The grain yield, economic coefficient, N, P and K uptake, harvest index, N agronomy efficiency and N uptake efficiency of maize and soybean increased significantly at the reduced nitrogen rate (180 N kg x hm(-2)), but the rate of soil N contribution declined, compared with the conventional rate of N application by local farmers (240 N kg x hm(-2)). In the reduced nitrogen rate treatment, total soil N and P contents of the maize strip reduced, whereas the total soil N, P and K contents of soybean strip and the total K content of maize strip increased compared with the zero N application treatment. With the reduced N application, the annual total grain yield, N, P and K uptake of above-ground biomass in the maize-soybean relay strip intercropping system were higher than in the monoculture, and the land equivalent ratio (LER) was 2.28. N uptake efficiency of maize in the relay strip intercropping system was 20.2% higher than in the maize monoculture, and the index of soybean was 30.5% lower than in the monoculture. The rate of soil N contribution in the relay strip intercropping system was 20.0% and 8.8% lower than in the maize and soybean monoculture, respectively. The reduced N application in the maize-soybean relay strip intercropping system was helpful to promote annual grain yield and improve N utilization efficiency.

Simultaneous monitoring of glucose and uric acid on a single test strip with dual channels.

PubMed

Guo, Jinhong; Ma, Xing

2017-08-15

The conventional test strip has usually only one electrochemical reaction channel, which requires two times figure punctures for the self-management of patients suffering from both diabetes and gout. Considering the large number of such patients and for the sake of reducing their pains, we report an enzymatic test strip which can simultaneously monitor glucose and uric acid (UA) with only one fingertip blood droplet. The proposed test strip is composed of dual channels. The glucose in blood is detected in the 1st channel above on the substrate and the UA is characterized in the 2nd channel located at the bottom of the substrate. The proposed design intensively matches the requirement of those patients simultaneously suffering from diabetes and gout. We carried out comparative investigations on the proposed test strip and clinical biochemical analyser, which indicates a good agreement and proved the reliability and accuracy of the proposed test strip, as promising solution for the fast growth of family health management market. Copyright © 2017 Elsevier B.V. All rights reserved.

Evaluation of the relative roles of a vegetative filter strip and a biofiltration swale in a treatment train for road runoff.

PubMed

Flanagan, Kelsey; Branchu, Philippe; Ramier, David; Gromaire, Marie-Christine

2017-02-01

In order to determine the relative importance of a vegetative filter strip and a biofiltration swale in a treatment train for road runoff, US EPA Storm Water Management Model was used to model infiltration and runoff from the filter strip. The model consisted of a series of subcatchments representing the road, the filter strip and the side-slopes of the swale. Simulations were carried out for different rain scenarios representing a variety of climatic conditions. In addition, a sensitivity analysis was conducted for the model's different parameters (soil characteristics and initial humidity, roughness, geometry, etc.). This exercise showed that for the system studied, the majority of road runoff is treated by the filter strip rather than the biofiltration swale, an effect observed especially during periods of low-intensity rainfall. Additionally, it was observed that the combination of infiltration of road runoff in the filter strip and direct rainfall on the system leads to a significant and variable dilution of the runoff reaching the swale. This result has important implications for evaluating the treatment efficiency of the system.

Integration of MnO2 thin film and carbon nanotubes to three-dimensional carbon microelectrodes for electrochemical microcapacitors

NASA Astrophysics Data System (ADS)

Jiang, Shulan; Shi, Tielin; Liu, Dan; Long, Hu; Xi, Shuang; Wu, Fengshun; Li, Xiaoping; Xia, Qi; Tang, Zirong

2014-09-01

Large-scale three-dimensional (3D) hybrid microelectrodes have been fabricated through modified carbon microelectromechanical systems (Carbon-MEMS) process and electrochemical deposition method. Greatly improved electrochemical performance has been shown for the 3D photoresist-derived carbon microelectrodes with the integration of carbon nanotubes (CNTs) and manganese dioxide (MnO2). The electrochemical measurements of the microelectrodes indicate that the specific geometric capacitance can reach up to 238 mF cm-2 at the current density of 0.5 mA cm-2. The capacitance loss is less than 18.2% of the original value after 6000 charge-discharge cycles. This study shows that stacking of MnO2 film and integrating of CNTs to the 3D glassy carbon microelectrodes have great potential for on-chip microcapacitors as energy storage devices, and the presented approach is promising for large-scale and low-cost manufacturing.

Silicon micro-mold and method for fabrication

DOEpatents

Morales, Alfredo M.

2005-01-11

The present invention describes a method for rapidly fabricating a robust 3-dimensional silicon micro-mold for use in preparing complex metal micro-components. The process begins by depositing a conductive metal layer onto one surface of a silicon wafer. A thin photoresist and a standard lithographic mask are then used to transfer a trace image pattern onto the opposite surface of the wafer by exposing and developing the resist. The exposed portion of the silicon substrate is anisotropically etched through the wafer thickness down to conductive metal layer to provide an etched pattern consisting of a series of rectilinear channels and recesses in the silicon which serve as the silicon micro-mold. Microcomponents are prepared with this mold by first filling the mold channels and recesses with a metal deposit, typically by electroplating, and then removing the silicon micro-mold by chemical etching.

Silicon/SU8 multi-electrode micro-needle for in vivo neurochemical monitoring.

PubMed

Vasylieva, Natalia; Marinesco, Stéphane; Barbier, Daniel; Sabac, Andrei

2015-10-15

Simultaneous monitoring of glucose and lactate is an important challenge for understanding brain energetics in physiological or pathological states. We demonstrate here a versatile method based on a minimally invasive single implantation in the rat brain. A silicon/SU8-polymer multi-sensing needle-shaped biosensor, was fabricated and tested. The multi-electrode array design comprises three platinum planar microelectrodes with a surface area of 40 × 200 µm(2) and a spacing of 200 µm, which were micromachined on a single 3mm long micro-needle having a 100 × 50 µm(2) cross-section for reduced tissue damage during implantation. Platinum micro-electrodes were aligned at the bottom of micro-wells obtained by photolithography on a SU8 photoresist layer. After clean room processing, each micro-electrode was functionalized inside the micro-wells by means of a micro-dispensing device, either with glucose oxidase or with lactate oxidase, which were cross-linked on the platinum electrodes. The third electrode covered with Bovine Serum Albumin (BSA) was used for the control of non-specific currents. The thick SU8 photoresist layer has revealed excellent electrical insulation of the micro-electrodes and between interconnection lines, and ensured a precise localization and packaging of the sensing enzymes on platinum micro-electrodes. During in vitro calibration with concentrations of analytes in the mM range, the micro-wells patterned in the SU8 photoresist proved to be highly effective in eliminating cross-talk signals, caused by H2O2 diffusion from closely spaced micro-electrodes. Moreover, our biosensor was successfully assayed in the rat cortex for simultaneous monitoring of both glucose and lactate during insulin and glucose administration. Copyright © 2015 Elsevier B.V. All rights reserved.

75 FR 6634 - Polyethylene Terephthalate Film, Sheet, and Strip from India: Final Results of Countervailing...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-02-10

... Film, Sheet, and Strip from India: Final Results of Countervailing Duty Administrative Review AGENCY... of the countervailing duty order on polyethylene terephthalate film, sheet, and strip (PET film) from India for the period January 1, 2007 through December 31, 2007. See Polyethylene Terephthalate Film...

76 FR 9745 - Polyethylene Terephthalate Film, Sheet, and Strip From Taiwan: Final Results of Antidumping Duty...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-02-22

... Film, Sheet, and Strip From Taiwan: Final Results of Antidumping Duty Administrative Review AGENCY... review of the antidumping duty order on polyethylene terephthalate film (PET Film) from Taiwan. See Polyethylene Terephthalate Film, Sheet, and Strip From Taiwan: Preliminary Results of Antidumping Duty...

76 FR 39855 - Polyethylene Terephthalate Film, Sheet and Strip From India: Rescission, in Part, of...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-07-07

... DEPARTMENT OF COMMERCE International Trade Administration [C-533-825] Polyethylene Terephthalate Film, Sheet and Strip From India: Rescission, in Part, of Countervailing Duty Administrative Review... order on polyethylene terephthalate film, sheet and strip from India covering the period January 1, 2009...

Distributed pressure sensors for a urethral catheter.

PubMed

Ahmadi, Mahdi; Rajamani, Rajesh; Timm, Gerald; Sezen, A S

2015-01-01

A flexible strip that incorporates multiple pressure sensors and is capable of being fixed to a urethral catheter is developed. The urethral catheter thus instrumented will be useful for measurement of pressure in a human urethra during urodynamic testing in a clinic. This would help diagnose the causes of urinary incontinence in patients. Capacitive pressure sensors are fabricated on a flexible polyimide-copper substrate using surface micromachining processes and alignment/assembly of the top and bottom portions of the sensor strip. The developed sensor strip is experimentally evaluated in an in vitro test rig using a pressure chamber. The sensor strip is shown to have adequate sensitivity and repeatability. While the calibration factors for the sensors on the strip vary from one sensor to another, even the least sensitive sensor has a resolution better than 0.1 psi.

MEDUSA-32: A low noise, low power silicon strip detector front-end electronics, for space applications

NASA Astrophysics Data System (ADS)

Cicuttin, Andres; Colavita, Alberto; Cerdeira, Alberto; Fratnik, Fabio; Vacchi, Andrea

1997-02-01

In this report we describe a mixed analog-digital integrated circuit (IC) designed as the front-end electronics for silicon strip-detectors for space applications. In space power consumption, compactness and robustness become critical constraints for a pre-amplifier design. The IC is a prototype with 32 complete channels, and it is intended for a large area particle tracker of a new generation of gamma ray telescopes. Each channel contains a charge sensitive amplifier, a pulse shaper, a discriminator and two digital buffers. The reference trip point of the discriminator is adjustable. This chip also has a custom PMOSFET transistor per channel, included in order to provide the high dynamic resistance needed to reverse-bias the strip diode. The digital part of the chip is used to store and serially shift out the state of the channels. There is also a storage buffer that allows the disabling of non-functioning channels if it is required by the data acquisition system. An input capacitance of 30 pF introduced at the input of the front-end produces less than 1000 electrons of RMS equivalent noise charge (ENC), for a total power dissipation of only 60 μW per channel. The chip was made using Orbit's 1.2 μm double poly, double metal n-well low noise CMOS process. The dimensions of the IC are 2400 μm × 8840 μm.

77 FR 14493 - Polyethylene Terephthalate Film, Sheet, and Strip From the People's Republic of China: Final...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-03-12

... Film, Sheet, and Strip From the People's Republic of China: Final Results of the 2009-2010 Antidumping... review of polyethylene terephthalate film, sheet, and strip (``PET film'') from the People's Republic of... this review. We invited interested parties to comment on our Preliminary Results. Based on our analysis...

77 FR 73428 - Polyethylene Terephthalate Film, Sheet, and Strip From the People's Republic of China...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-12-10

... Film, Sheet, and Strip From the People's Republic of China: Preliminary Results of Administrative... terephthalate film, sheet, and strip (``PET film'') from the People's Republic of China (``PRC''), covering the...: Scope of Order The products covered by the order are all gauges of raw, pre- treated, or primed PET film...

78 FR 42105 - Polyethylene Terephthalate Film, Sheet, and Strip From India and Taiwan; Notice of Commission...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-07-15

...)] Polyethylene Terephthalate Film, Sheet, and Strip From India and Taiwan; Notice of Commission Determinations To... countervailing duty order on polyethylene terephthalate film, sheet, and strip (``PET'' film) from India and the antidumping duty orders on PET film from India and Taiwan would be likely to lead to continuation or...

Degree of Phosphorus Saturation and Soil Phosphorus Thresholds in an Ultisol Amended with Triple Superphosphate and Phosphate Rocks

PubMed Central

Gikonyo, E. W.; Zaharah, A. R.; Hanafi, M. M.; Anuar, A. R.

2011-01-01

Soil phosphorus (P) release capability could be assessed through the degree of P saturation (DPS). Our main objective was to determine DPS and, hence, P threshold DPS values of an Ultisol treated with triple superphosphate (TSP), Gafsa phosphate rocks (GPR), or Christmas Island phosphate rocks (CIPR), plus or minus manure. P release was determined by the iron oxide—impregnated paper strip (strip P), while DPS was determined from ammonium oxalate—extractable aluminum (Al), iron (Fe), and P. Soils were sampled from a closed incubation study involving soils treated with TSP, GPR, and CIPR at 0–400 mg P kg-1, and a field study where soils were fertilized with the same P sources at 100–300 kg P ha-1 plus or minus manure. The DPS was significantly influenced by P source x P rate, P source x manure (incubated soils), and by P source x P rate x time (field-sampled soils). Incubated soil results indicated that both initial P and total strip P were related to DPS by exponential functions: initial strip P = 1.38exp0.18DPS, R2 = 0.82** and total strip P = 8.01exp0.13DPS, R2 = 0.65**. Initial strip P was linearly related to total P; total P = 2.45, initial P + 8.41, R2 = 0.85**. The threshold DPS value established was about 22% (incubated soil). Field soils had lower DPS values <12% and strip P was related to initial DPS and average DPS in exponential functions: strip P = 2.6exp0.44DPS, R2 = 0.77** and strip P = 1.1DPS2 — 2.4DPS + 6.2, R2 = 0.58**, respectively. The threshold values were both at ≈8% and P release was 11–14 mg P kg-1. Results are evident that DPS can be used to predict P release, but the threshold values are environmentally sensitive; hence, recommendations should be based on field trials. PMID:21805012

Study of surface properties of ATLAS12 strip sensors and their radiation resistance

NASA Astrophysics Data System (ADS)

Mikestikova, M.; Allport, P. P.; Baca, M.; Broughton, J.; Chisholm, A.; Nikolopoulos, K.; Pyatt, S.; Thomas, J. P.; Wilson, J. A.; Kierstead, J.; Kuczewski, P.; Lynn, D.; Hommels, L. B. A.; Ullan, M.; Bloch, I.; Gregor, I. M.; Tackmann, K.; Hauser, M.; Jakobs, K.; Kuehn, S.; Mahboubi, K.; Mori, R.; Parzefall, U.; Clark, A.; Ferrere, D.; Sevilla, S. Gonzalez; Ashby, J.; Blue, A.; Bates, R.; Buttar, C.; Doherty, F.; McMullen, T.; McEwan, F.; O'Shea, V.; Kamada, S.; Yamamura, K.; Ikegami, Y.; Nakamura, K.; Takubo, Y.; Unno, Y.; Takashima, R.; Chilingarov, A.; Fox, H.; Affolder, A. A.; Casse, G.; Dervan, P.; Forshaw, D.; Greenall, A.; Wonsak, S.; Wormald, M.; Cindro, V.; Kramberger, G.; Mandić, I.; Mikuž, M.; Gorelov, I.; Hoeferkamp, M.; Palni, P.; Seidel, S.; Taylor, A.; Toms, K.; Wang, R.; Hessey, N. P.; Valencic, N.; Hanagaki, K.; Dolezal, Z.; Kodys, P.; Bohm, J.; Stastny, J.; Bevan, A.; Beck, G.; Milke, C.; Domingo, M.; Fadeyev, V.; Galloway, Z.; Hibbard-Lubow, D.; Liang, Z.; Sadrozinski, H. F.-W.; Seiden, A.; To, K.; French, R.; Hodgson, P.; Marin-Reyes, H.; Parker, K.; Jinnouchi, O.; Hara, K.; Sato, K.; Hagihara, M.; Iwabuchi, S.; Bernabeu, J.; Civera, J. V.; Garcia, C.; Lacasta, C.; Marti i Garcia, S.; Rodriguez, D.; Santoyo, D.; Solaz, C.; Soldevila, U.

2016-09-01

A radiation hard n+-in-p micro-strip sensor for the use in the Upgrade of the strip tracker of the ATLAS experiment at the High Luminosity Large Hadron Collider (HL-LHC) has been developed by the "ATLAS ITk Strip Sensor collaboration" and produced by Hamamatsu Photonics. Surface properties of different types of end-cap and barrel miniature sensors of the latest sensor design ATLAS12 have been studied before and after irradiation. The tested barrel sensors vary in "punch-through protection" (PTP) structure, and the end-cap sensors, whose stereo-strips differ in fan geometry, in strip pitch and in edge strip ganging options. Sensors have been irradiated with proton fluences of up to 1×1016 neq/cm2, by reactor neutron fluence of 1×1015 neq/cm2 and by gamma rays from 60Co up to dose of 1 MGy. The main goal of the present study is to characterize the leakage current for micro-discharge breakdown voltage estimation, the inter-strip resistance and capacitance, the bias resistance and the effectiveness of PTP structures as a function of bias voltage and fluence. It has been verified that the ATLAS12 sensors have high breakdown voltage well above the operational voltage which implies that different geometries of sensors do not influence their stability. The inter-strip isolation is a strong function of irradiation fluence, however the sensor performance is acceptable in the expected range for HL-LHC. New gated PTP structure exhibits low PTP onset voltage and sharp cut-off of effective resistance even at the highest tested radiation fluence. The inter-strip capacitance complies with the technical specification required before irradiation and no radiation-induced degradation was observed. A summary of ATLAS12 sensors tests is presented including a comparison of results from different irradiation sites. The measured characteristics are compared with the previous prototype of the sensor design, ATLAS07.

Degree of phosphorus saturation and soil phosphorus thresholds in an ultisol amended with triple superphosphate and phosphate rocks.

PubMed

Gikonyo, E W; Zaharah, A R; Hanafi, M M; Anuar, A R

2011-07-28

Soil phosphorus (P) release capability could be assessed through the degree of P saturation (DPS). Our main objective was to determine DPS and, hence, P threshold DPS values of an Ultisol treated with triple superphosphate (TSP), Gafsa phosphate rocks (GPR), or Christmas Island phosphate rocks (CIPR), plus or minus manure. P release was determined by the iron oxide-impregnated paper strip (strip P), while DPS was determined from ammonium oxalate-extractable aluminum (Al), iron (Fe), and P. Soils were sampled from a closed incubation study involving soils treated with TSP, GPR, and CIPR at 0-400 mg P kg-1, and a field study where soils were fertilized with the same P sources at 100-300 kg P ha-1 plus or minus manure. The DPS was significantly influenced by P source x P rate, P source x manure (incubated soils), and by P source x P rate x time (field-sampled soils). Incubated soil results indicated that both initial P and total strip P were related to DPS by exponential functions: initial strip P = 1.38exp0.18DPS, R2 = 0.82** and total strip P = 8.01exp0.13DPS, R2 = 0.65**. Initial strip P was linearly related to total P; total P = 2.45, initial P + 8.41, R2 = 0.85**. The threshold DPS value established was about 22% (incubated soil). Field soils had lower DPS values <12% and strip P was related to initial DPS and average DPS in exponential functions: strip P = 2.6exp0.44DPS, R2 = 0.77** and strip P = 1.1DPS2 ¨C 2.4DPS + 6.2, R2 = 0.58**, respectively. The threshold values were both approximately equal to 8% and P release was 11-14 mg P kg-1. Results are evident that DPS can be used to predict P release, but the threshold values are environmentally sensitive; hence, recommendations should be based on field trials.

Weld leaks rapidly and safely detected

NASA Technical Reports Server (NTRS)

1965-01-01

Test method detects leaks that occur during hydrostatic pressure testing of welded joints in metal tanks. A strip of aluminum foil and a strip of water-soluble paper are placed over the weld. A voltage applied between the tank wall and the foil strip is monitored to detect a decrease in ohmic resistance caused by water leakage into the paper layer.

76 FR 27005 - Polyethylene Terephthalate Film, Sheet, and Strip From the Republic of Korea: Initiation and...

Federal Register 2010, 2011, 2012, 2013, 2014

2011-05-10

... Film, Sheet, and Strip From the Republic of Korea: Initiation and Preliminary Results of Antidumping... changed circumstances review of the antidumping duty order on polyethylene terephthalate film, sheet and strip (PET film) from the Republic of Korea (Korea) pursuant to section 751(b) of the Tariff Act of 1930...

Tree planting - strip-mined area in Maryland

Treesearch

Fred L. Bagley

1980-01-01

This report is written to elucidate some of the problems encountered in the planting of trees on strip-mined areas in Maryland. When problems are recognized, normally a solution (or at least, an improvement) can be instituted to alleviate the problem. The methods cited herein are those of experienced foresters engaged in strip-mine planting during the past seventeen...

Reforestation of strip-mined lands in West Virginia

Treesearch

H. Spencer Potter; Sidney Weitzman; George R., Jr. Trimble

1951-01-01

The early 1940's witnessed a striking increase in strip-mining throughout the eastern coal region. West Virginia, with its extensive coal resources, naturally was caught in the full current of this shift in mining methods. Today the raw gash on the hillside - almost infallibly the mark of a strip-mine operation - is a familiar sight in the State.