One-Step Reforming of CO2 and CH4 into High-Value Liquid Chemicals and Fuels at Room Temperature by Plasma-Driven Catalysis.

PubMed

Wang, Li; Yi, Yanhui; Wu, Chunfei; Guo, Hongchen; Tu, Xin

2017-10-23

The conversion of CO 2 with CH 4 into liquid fuels and chemicals in a single-step catalytic process that bypasses the production of syngas remains a challenge. In this study, liquid fuels and chemicals (e.g., acetic acid, methanol, ethanol, and formaldehyde) were synthesized in a one-step process from CO 2 and CH 4 at room temperature (30 °C) and atmospheric pressure for the first time by using a novel plasma reactor with a water electrode. The total selectivity to oxygenates was approximately 50-60 %, with acetic acid being the major component at 40.2 % selectivity, the highest value reported for acetic acid thus far. Interestingly, the direct plasma synthesis of acetic acid from CH 4 and CO 2 is an ideal reaction with 100 % atom economy, but it is almost impossible by thermal catalysis owing to the significant thermodynamic barrier. The combination of plasma and catalyst in this process shows great potential for manipulating the distribution of liquid chemical products in a given process. © 2017 The Authors. Published by Wiley-VCH Verlag GmbH & Co. KGaA.

Temperature dependence on plasma-induced damage and chemical reactions in GaN etching processes using chlorine plasma

NASA Astrophysics Data System (ADS)

Liu, Zecheng; Ishikawa, Kenji; Imamura, Masato; Tsutsumi, Takayoshi; Kondo, Hiroki; Oda, Osamu; Sekine, Makoto; Hori, Masaru

2018-06-01

Plasma-induced damage (PID) on GaN was optimally reduced by high-temperature chlorine plasma etching. Energetic ion bombardments primarily induced PID involving stoichiometry, surface roughness, and photoluminescence (PL) degradation. Chemical reactions under ultraviolet (UV) irradiation and chlorine radical exposure at temperatures higher than 400 °C can be controlled by taking into account the synergism of simultaneous photon and radical irradiations to effectively reduce PID.

Plasma-water interactions at atmospheric pressure in a dc microplasma

NASA Astrophysics Data System (ADS)

Patel, Jenish; Němcová, Lucie; Mitra, Somak; Graham, William; Maguire, Paul; Švrček, Vladimir; Mariotti, Davide

2013-09-01

Plasma-liquid interactions generate a variety of chemical species that are very useful for the treatment of many materials and that makes plasma-induced liquid chemistry (PiLC) very attractive for industrial applications. The understanding of plasma-induced chemistry with water can open up a vast range of plasma-activated chemistry in liquid with enormous potential for the synthesis of chemical compounds, nanomaterials synthesis and functionalization. However, this basic understanding of the chemistry occurring at the plasma-liquid interface is still poor. In the present study, different properties of water are analysed when processed by plasma at atmospheric-pressure with different conditions. In particular, pH, temperature and conductivity of water are measured against current and time of plasma processing. We also observed the formation of molecular oxygen (O2) and hydrogen peroxide (H2O2) for the same plasma conditions. The current of plasma processing was found to affect the water properties and the production of hydrogen peroxide in water. The relation between the number of electrons injected from plasma in water and the number of H2O2 molecules was established and based on these results a scenario of reactions channels activated by plasma-water interface is concluded.

Non-equilibrium synergistic effects in atmospheric pressure plasmas.

PubMed

Guo, Heng; Zhang, Xiao-Ning; Chen, Jian; Li, He-Ping; Ostrikov, Kostya Ken

2018-03-19

Non-equilibrium is one of the important features of an atmospheric gas discharge plasma. It involves complicated physical-chemical processes and plays a key role in various actual plasma processing. In this report, a novel complete non-equilibrium model is developed to reveal the non-equilibrium synergistic effects for the atmospheric-pressure low-temperature plasmas (AP-LTPs). It combines a thermal-chemical non-equilibrium fluid model for the quasi-neutral plasma region and a simplified sheath model for the electrode sheath region. The free-burning argon arc is selected as a model system because both the electrical-thermal-chemical equilibrium and non-equilibrium regions are involved simultaneously in this arc plasma system. The modeling results indicate for the first time that it is the strong and synergistic interactions among the mass, momentum and energy transfer processes that determine the self-consistent non-equilibrium characteristics of the AP-LTPs. An energy transfer process related to the non-uniform spatial distributions of the electron-to-heavy-particle temperature ratio has also been discovered for the first time. It has a significant influence for self-consistently predicting the transition region between the "hot" and "cold" equilibrium regions of an AP-LTP system. The modeling results would provide an instructive guidance for predicting and possibly controlling the non-equilibrium particle-energy transportation process in various AP-LTPs in future.

Plasma filtering techniques for nuclear waste remediation

DOE PAGES

Gueroult, Renaud; Hobbs, David T.; Fisch, Nathaniel J.

2015-04-24

Nuclear waste cleanup is challenged by the handling of feed stocks that are both unknown and complex. Plasma filtering, operating on dissociated elements, offers advantages over chemical methods in processing such wastes. The costs incurred by plasma mass filtering for nuclear waste pretreatment, before ultimate disposal, are similar to those for chemical pretreatment. However, significant savings might be achieved in minimizing the waste mass. As a result, this advantage may be realized over a large range of chemical waste compositions, thereby addressing the heterogeneity of legacy nuclear waste.

Plasma flow reactor for steady state monitoring of physical and chemical processes at high temperatures.

PubMed

Koroglu, Batikan; Mehl, Marco; Armstrong, Michael R; Crowhurst, Jonathan C; Weisz, David G; Zaug, Joseph M; Dai, Zurong; Radousky, Harry B; Chernov, Alex; Ramon, Erick; Stavrou, Elissaios; Knight, Kim; Fabris, Andrea L; Cappelli, Mark A; Rose, Timothy P

2017-09-01

We present the development of a steady state plasma flow reactor to investigate gas phase physical and chemical processes that occur at high temperature (1000 < T < 5000 K) and atmospheric pressure. The reactor consists of a glass tube that is attached to an inductively coupled argon plasma generator via an adaptor (ring flow injector). We have modeled the system using computational fluid dynamics simulations that are bounded by measured temperatures. In situ line-of-sight optical emission and absorption spectroscopy have been used to determine the structures and concentrations of molecules formed during rapid cooling of reactants after they pass through the plasma. Emission spectroscopy also enables us to determine the temperatures at which these dynamic processes occur. A sample collection probe inserted from the open end of the reactor is used to collect condensed materials and analyze them ex situ using electron microscopy. The preliminary results of two separate investigations involving the condensation of metal oxides and chemical kinetics of high-temperature gas reactions are discussed.

Two dimensional radial gas flows in atmospheric pressure plasma-enhanced chemical vapor deposition

NASA Astrophysics Data System (ADS)

Kim, Gwihyun; Park, Seran; Shin, Hyunsu; Song, Seungho; Oh, Hoon-Jung; Ko, Dae Hong; Choi, Jung-Il; Baik, Seung Jae

2017-12-01

Atmospheric pressure (AP) operation of plasma-enhanced chemical vapor deposition (PECVD) is one of promising concepts for high quality and low cost processing. Atmospheric plasma discharge requires narrow gap configuration, which causes an inherent feature of AP PECVD. Two dimensional radial gas flows in AP PECVD induces radial variation of mass-transport and that of substrate temperature. The opposite trend of these variations would be the key consideration in the development of uniform deposition process. Another inherent feature of AP PECVD is confined plasma discharge, from which volume power density concept is derived as a key parameter for the control of deposition rate. We investigated deposition rate as a function of volume power density, gas flux, source gas partial pressure, hydrogen partial pressure, plasma source frequency, and substrate temperature; and derived a design guideline of deposition tool and process development in terms of deposition rate and uniformity.

High growth rate homoepitaxial diamond film deposition at high temperatures by microwave plasma-assisted chemical vapor deposition

NASA Technical Reports Server (NTRS)

Vohra, Yogesh K. (Inventor); McCauley, Thomas S. (Inventor)

1997-01-01

The deposition of high quality diamond films at high linear growth rates and substrate temperatures for microwave-plasma chemical vapor deposition is disclosed. The linear growth rate achieved for this process is generally greater than 50 .mu.m/hr for high quality films, as compared to rates of less than 5 .mu.m/hr generally reported for MPCVD processes.

Applying chemical engineering concepts to non-thermal plasma reactors

NASA Astrophysics Data System (ADS)

Pedro AFFONSO, NOBREGA; Alain, GAUNAND; Vandad, ROHANI; François, CAUNEAU; Laurent, FULCHERI

2018-06-01

Process scale-up remains a considerable challenge for environmental applications of non-thermal plasmas. Undersanding the impact of reactor hydrodynamics in the performance of the process is a key step to overcome this challenge. In this work, we apply chemical engineering concepts to analyse the impact that different non-thermal plasma reactor configurations and regimes, such as laminar or plug flow, may have on the reactor performance. We do this in the particular context of the removal of pollutants by non-thermal plasmas, for which a simplified model is available. We generalise this model to different reactor configurations and, under certain hypotheses, we show that a reactor in the laminar regime may have a behaviour significantly different from one in the plug flow regime, often assumed in the non-thermal plasma literature. On the other hand, we show that a packed-bed reactor behaves very similarly to one in the plug flow regime. Beyond those results, the reader will find in this work a quick introduction to chemical reaction engineering concepts.

Plasma for environment

NASA Astrophysics Data System (ADS)

Van Oost, G.

2017-11-01

Human activity is associated with the permanent emergence of a very wide range of waste streams. The most widely used treatment of waste is thermal processing such as incineration. An alternative environmentally friendly process is based on thermal plasma technology which is a very flexible tool because it allows to operate in a wide temperature range with almost any chemical composition of waste and chemicals needed for processing this waste, and to convert organic waste into energy or chemical substances as well as to destroy toxic organic compounds, and to vitrify radioactive waste in a scenario that for each specific type of waste can be considered optimal, both in terms of energy efficiency and environmental safety.

Plasma for environment

NASA Astrophysics Data System (ADS)

Van Oost, G.

2017-12-01

Human activity is associated with the permanent emergence of a very wide range of waste streams. The most widely used treatment of waste is thermal processing such as incineration. An alternative environmentally friendly process is based on thermal plasma technology which is a very flexible tool because it allows to operate in a wide temperature range with almost any chemical composition of waste and chemicals needed for processing this waste. It allows the conversion of organic waste into energy or chemical substances as well as the destruction of toxic organic compounds in a scenario that for each specific type of waste can be considered optimal, both in terms of energy efficiency and environmental safety.

One‐Step Reforming of CO2 and CH4 into High‐Value Liquid Chemicals and Fuels at Room Temperature by Plasma‐Driven Catalysis

PubMed Central

Wang, Li; Yi, Yanhui; Wu, Chunfei; Guo, Hongchen

2017-01-01

Abstract The conversion of CO2 with CH4 into liquid fuels and chemicals in a single‐step catalytic process that bypasses the production of syngas remains a challenge. In this study, liquid fuels and chemicals (e.g., acetic acid, methanol, ethanol, and formaldehyde) were synthesized in a one‐step process from CO2 and CH4 at room temperature (30 °C) and atmospheric pressure for the first time by using a novel plasma reactor with a water electrode. The total selectivity to oxygenates was approximately 50–60 %, with acetic acid being the major component at 40.2 % selectivity, the highest value reported for acetic acid thus far. Interestingly, the direct plasma synthesis of acetic acid from CH4 and CO2 is an ideal reaction with 100 % atom economy, but it is almost impossible by thermal catalysis owing to the significant thermodynamic barrier. The combination of plasma and catalyst in this process shows great potential for manipulating the distribution of liquid chemical products in a given process. PMID:28842938

Plasma filtering techniques for nuclear waste remediation.

PubMed

Gueroult, Renaud; Hobbs, David T; Fisch, Nathaniel J

2015-10-30

Nuclear waste cleanup is challenged by the handling of feed stocks that are both unknown and complex. Plasma filtering, operating on dissociated elements, offers advantages over chemical methods in processing such wastes. The costs incurred by plasma mass filtering for nuclear waste pretreatment, before ultimate disposal, are similar to those for chemical pretreatment. However, significant savings might be achieved in minimizing the waste mass. This advantage may be realized over a large range of chemical waste compositions, thereby addressing the heterogeneity of legacy nuclear waste. Copyright © 2015 Elsevier B.V. All rights reserved.

Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

PubMed Central

Hentschel, Carsten; Fontein, Florian; Stegemann, Linda; Hoeppener, Christiane; Fuchs, Harald; Hoeppener, Stefanie

2014-01-01

Summary A general concept for parallel near-field photochemical and radiation-induced chemical processes for the fabrication of nanopatterns of a self-assembled monolayer (SAM) of (3-aminopropyl)triethoxysilane (APTES) is explored with three different processes: 1) a near-field photochemical process by photochemical bleaching of a monomolecular layer of dye molecules chemically bound to an APTES SAM, 2) a chemical process induced by oxygen plasma etching as well as 3) a combined near-field UV-photochemical and ozone-induced chemical process, which is applied directly to an APTES SAM. All approaches employ a sandwich configuration of the surface-supported SAM, and a lithographic mask in form of gold nanostructures fabricated through colloidal sphere lithography (CL), which is either exposed to visible light, oxygen plasma or an UV–ozone atmosphere. The gold mask has the function to inhibit the photochemical reactions by highly localized near-field interactions between metal mask and SAM and to inhibit the radiation-induced chemical reactions by casting a highly localized shadow. The removal of the gold mask reveals the SAM nanopattern. PMID:25247126

A Course on Plasma Processing in Integrated Circuit Fabrication.

ERIC Educational Resources Information Center

Sawin, Herbert H.; Reif, Rafael

1983-01-01

Describes a course, taught jointly by electrical/chemical engineering departments at the Massachusetts Institute of Technology, designed to teach the fundamental science of plasma processing as well as to give an overview of the present state of industrial processes. Provides rationale for course development, texts used, class composition, and…

Plasma flow reactor for steady state monitoring of physical and chemical processes at high temperatures

DOE Office of Scientific and Technical Information (OSTI.GOV)

Koroglu, Batikan; Mehl, Marco; Armstrong, Michael R.

Here, we present the development of a steady state plasma flow reactor to investigate gas phase physical and chemical processes that occur at high temperature (1000 < T < 5000 K) and atmospheric pressure. The reactor consists of a glass tube that is attached to an inductively coupled argon plasma generator via an adaptor (ring flow injector). We have modeled the system using computational fluid dynamics simulations that are bounded by measured temperatures. In situ line-of-sight optical emission and absorption spectroscopy have been used to determine the structures and concentrations of molecules formed during rapid cooling of reactants after theymore » pass through the plasma. Emission spectroscopy also enables us to determine the temperatures at which these dynamic processes occur. A sample collection probe inserted from the open end of the reactor is used to collect condensed materials and analyze them ex situ using electron microscopy. The preliminary results of two separate investigations involving the condensation of metal oxides and chemical kinetics of high-temperature gas reactions are discussed.« less

Plasma flow reactor for steady state monitoring of physical and chemical processes at high temperatures

DOE PAGES

Koroglu, Batikan; Mehl, Marco; Armstrong, Michael R.; ...

2017-09-11

Here, we present the development of a steady state plasma flow reactor to investigate gas phase physical and chemical processes that occur at high temperature (1000 < T < 5000 K) and atmospheric pressure. The reactor consists of a glass tube that is attached to an inductively coupled argon plasma generator via an adaptor (ring flow injector). We have modeled the system using computational fluid dynamics simulations that are bounded by measured temperatures. In situ line-of-sight optical emission and absorption spectroscopy have been used to determine the structures and concentrations of molecules formed during rapid cooling of reactants after theymore » pass through the plasma. Emission spectroscopy also enables us to determine the temperatures at which these dynamic processes occur. A sample collection probe inserted from the open end of the reactor is used to collect condensed materials and analyze them ex situ using electron microscopy. The preliminary results of two separate investigations involving the condensation of metal oxides and chemical kinetics of high-temperature gas reactions are discussed.« less

Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation

NASA Astrophysics Data System (ADS)

Liu, Zecheng; Imamura, Masato; Asano, Atsuki; Ishikawa, Kenji; Takeda, Keigo; Kondo, Hiroki; Oda, Osamu; Sekine, Makoto; Hori, Masaru

2017-08-01

Surface chemical reactions on the GaN surface with Cl radicals are thermally enhanced in the high-temperature Cl2 plasma etching of GaN, resulting in the formation of etch pits and thereby, a roughened surface. Simultaneous irradiation of ultraviolet (UV) photons in Cl2 plasma emissions with wavelengths of 258 and 306 nm reduces the surface chemical reactions because of the photodissociation of both Ga and N chlorides, which leads to a suppression of the increase in surface roughness. Compared with Si-related materials, we point out that photon-induced reactions should be taken into account during the plasma processing of wide-bandgap semiconductors.

Towards Ideal NOx and CO2 Emission Control Technology for Bio-Oils Combustion Energy System Using a Plasma-Chemical Hybrid Process

NASA Astrophysics Data System (ADS)

Okubo, M.; Fujishima, H.; Yamato, Y.; Kuroki, T.; Tanaka, A.; Otsuka, K.

2013-03-01

A pilot-scale low-emission boiler system consisting of a bio-fuel boiler and plasma-chemical hybrid NOx removal system is investigated. This system can achieve carbon neutrality because the bio-fuel boiler uses waste vegetable oil as one of the fuels. The plasma-chemical hybrid NOx removal system has two processes: NO oxidation by ozone produced from plasma ozonizers and NO2 removal using a Na2SO3 chemical scrubber. Test demonstrations of the system are carried out for mixed oils (mixture of A-heavy oil and waste vegetable oil). Stable combustion is achieved for the mixed oil (20 - 50% waste vegetable oil). Properties of flue gas—e.g., O2, CO2 and NOx—when firing mixed oils are nearly the same as those when firing heavy oil for an average flue gas flow rate of 1000 Nm3/h. NOx concentrations at the boiler outlet are 90 - 95 ppm. Furthermore, during a 300-min continuous operation when firing 20% mixed oil, NOx removal efficiency of more than 90% (less than 10 ppm NOx emission) is confirmed. In addition, the CO2 reduction when heavy oil is replaced with waste vegetable oil is estimated. The system comparison is described between the plasma-chemical hybrid NOx removal and the conventional technology.

A solid-state nuclear magnetic resonance study of post-plasma reactions in organosilicone microwave plasma-enhanced chemical vapor deposition (PECVD) coatings.

PubMed

Hall, Colin J; Ponnusamy, Thirunavukkarasu; Murphy, Peter J; Lindberg, Mats; Antzutkin, Oleg N; Griesser, Hans J

2014-06-11

Plasma-polymerized organosilicone coatings can be used to impart abrasion resistance and barrier properties to plastic substrates such as polycarbonate. Coating rates suitable for industrial-scale deposition, up to 100 nm/s, can be achieved through the use of microwave plasma-enhanced chemical vapor deposition (PECVD), with optimal process vapors such as tetramethyldisiloxane (TMDSO) and oxygen. However, it has been found that under certain deposition conditions, such coatings are subject to post-plasma changes; crazing or cracking can occur anytime from days to months after deposition. To understand the cause of the crazing and its dependence on processing plasma parameters, the effects of post-plasma reactions on the chemical bonding structure of coatings deposited with varying TMDSO-to-O2 ratios was studied with (29)Si and (13)C solid-state magic angle spinning nuclear magnetic resonance (MAS NMR) using both single-pulse and cross-polarization techniques. The coatings showed complex chemical compositions significantly altered from the parent monomer. (29)Si MAS NMR spectra revealed four main groups of resonance lines, which correspond to four siloxane moieties (i.e., mono (M), di (D), tri (T), and quaternary (Q)) and how they are bound to oxygen. Quantitative measurements showed that the ratio of TMDSO to oxygen could shift the chemical structure of the coating from 39% to 55% in Q-type bonds and from 28% to 16% for D-type bonds. Post-plasma reactions were found to produce changes in relative intensities of (29)Si resonance lines. The NMR data were complemented by Fourier transform infrared (FTIR) spectroscopy. Together, these techniques have shown that the bonding environment of Si is drastically altered by varying the TMDSO-to-O2 ratio during PECVD, and that post-plasma reactions increase the cross-link density of the silicon-oxygen network. It appears that Si-H and Si-OH chemical groups are the most susceptible to post-plasma reactions. Coatings produced at a low TMDSO-to-oxygen ratio had little to no singly substituted moieties, displayed a highly cross-linked structure, and showed less post-plasma reactions. However, these chemically more stable coatings are less compatible mechanically with plastic substrates, because of their high stiffness.

Inductively and capacitively coupled plasmas at interface: A comparative study towards highly efficient amorphous-crystalline Si solar cells

NASA Astrophysics Data System (ADS)

Guo, Yingnan; Ong, Thiam Min Brian; Levchenko, I.; Xu, Shuyan

2018-01-01

A comparative study on the application of two quite different plasma-based techniques to the preparation of amorphous/crystalline silicon (a-Si:H/c-Si) interfaces for solar cells is presented. The interfaces were fabricated and processed by hydrogen plasma treatment using the conventional plasma-enhanced chemical vacuum deposition (PECVD) and inductively coupled plasma chemical vapour deposition (ICP-CVD) methods The influence of processing temperature, radio-frequency power, treatment duration and other parameters on interface properties and degree of surface passivation were studied. It was found that passivation could be improved by post-deposition treatment using both ICP-CVD and PECVD, but PECVD treatment is more efficient for the improvement on passivation quality, whereas the minority carrier lifetime increased from 1.65 × 10-4 to 2.25 × 10-4 and 3.35 × 10-4 s after the hydrogen plasma treatment by ICP-CVD and PECVD, respectively. In addition to the improvement of carrier lifetimes at low temperatures, low RF powers and short processing times, both techniques are efficient in band gap adjustment at sophisticated interfaces.

Consequences of plasma oxidation and vacuum annealing on the chemical properties and electron accumulation of In2O3 surfaces

NASA Astrophysics Data System (ADS)

Berthold, Theresa; Rombach, Julius; Stauden, Thomas; Polyakov, Vladimir; Cimalla, Volker; Krischok, Stefan; Bierwagen, Oliver; Himmerlich, Marcel

2016-12-01

The influence of oxygen plasma treatments on the surface chemistry and electronic properties of unintentionally doped and Mg-doped In2O3(111) films grown by plasma-assisted molecular beam epitaxy or metal-organic chemical vapor deposition is studied by photoelectron spectroscopy. We evaluate the impact of semiconductor processing technology relevant treatments by an inductively coupled oxygen plasma on the electronic surface properties. In order to determine the underlying reaction processes and chemical changes during film surface-oxygen plasma interaction and to identify reasons for the induced electron depletion, in situ characterization was performed implementing a dielectric barrier discharge oxygen plasma as well as vacuum annealing. The strong depletion of the initial surface electron accumulation layer is identified to be caused by adsorption of reactive oxygen species, which induce an electron transfer from the semiconductor to localized adsorbate states. The chemical modification is found to be restricted to the topmost surface and adsorbate layers. The change in band bending mainly depends on the amount of attached oxygen adatoms and the film bulk electron concentration as confirmed by calculations of the influence of surface state density on the electron concentration and band edge profile using coupled Schrödinger-Poisson calculations. During plasma oxidation, hydrocarbon surface impurities are effectively removed and surface defect states, attributed to oxygen vacancies, vanish. The recurring surface electron accumulation after subsequent vacuum annealing can be consequently explained by surface oxygen vacancies.

Development of non-thermal plasma jet and its potential application for color degradation of organic pollutant in wastewater treatment

NASA Astrophysics Data System (ADS)

Pirdo Kasih, Tota; Kharisma, Angel; Perdana, Muhammad Kevin; Murphiyanto, Richard Dimas Julian

2017-12-01

This paper presents the development of non-thermal plasma-based AOPs for color degradation in wastewater treatment. The plasma itself was generated by an in-house high voltage power supply (HVPS). Instead of gas-phase plasma system, we applied plasma jet system underwater during wastewater treatment without additional any chemicals (chemical-free processing). The method is thought to maximize the energy transfer and increase the efficient interaction between plasma and solution during the process. Our plasma jet system could proceed either by using helium (He), argon (Ar) and air as the medium in an open air atmosphere. Exploring the developed plasma to be applied in organic wastewater treatment, we demonstrated that the plasma jet could be generated underwater and yields in color degradation of methylene blue (MB) wastewater model. When using Ar gas as a medium, the color degradation of MB could be achieved within 90 minutes. Whereas, by using Ar with an admixing of oxygen (O2) gas, the similar result could be accomplished within 60 minutes. Additional O2 gas in the latter might produce more hydroxyl radicals and oxygen-based species which speed up the oxidative reaction with organic pollutants, and hence accelerate the process of color degradation.

Conversion of CO2 to CO using radio-frequency atmospheric pressure plasmas

NASA Astrophysics Data System (ADS)

Foote, Alexander; Dedrick, James; O'Connell, Deborah; North, Michael; Gans, Timo

2016-09-01

Low temperature plasmas can be used for the in situ generation of CO, from relatively non-toxic CO2 . CO is very useful in many industrial chemical processes and so, via low temperature plasmas, CO2, a waste product, can be converted into a valuable chemical. The key challenges in using this method, for CO production, are optimising the energy efficiency, maximising the conversion of CO2 into CO and then separating the CO from the other species produced in the plasma. Very high yields of CO, greater than 90%, have been achieved at atmospheric pressure using argon as a carrier gas with admixtures up to 1.5% with energy efficiencies of up to 4%. The plasma generated in continuous and spatially homogeneous and is driven at a frequency of 40.68 MHz. A zero dimensional global model has also been used to simulate the chemical kinetics of the plasma to determine the dominant dissociation processes and is in good agreement with the experimentally determined yields. The model is used to determine how important a role the vibrational states of CO2 are, in a highly collisional plasma, to the production of CO and there can provide insight into how to improve the energy efficiency and suppress unwanted reactions.

Plasma-chemical processes accompanying discharge in air excited by a microwave beam

NASA Astrophysics Data System (ADS)

Askar'ian, G. A.; Batanov, G. M.; Gritsinin, S. I.; Kossyi, I. A.; Kostinskii, A. Iu.

1990-11-01

Experimental results are presented on plasma-chemical processes of nitrogen oxidation and ozone production accompanying microwave discharge in dry air and in nitrogen-oxygen mixtures. The degree of nitrogen oxidation and the energy expenditure toward the formation of oxides as a function of discharge conditions are established. The experimental results can be explained by assuming oxidation reactions of electron-excited metastable nitrogen molecules by oxygen atoms. Low ozone concentrations in the discharge indicate a significant energy input into the gas.

Modeling of Mutual Anion-Cation Neutralization Processes

DTIC Science & Technology

2011-07-01

Chemical Kinetics, Plasma Chemistry 16. SECURITY CLASSIFICATION OF: 17. LIMITATION OF ABSTRACT SAR 18, NUMBER OF PAGES 9 19a. NAME OF...understanding of elementary processes in plasma chemistry , conducted jointly with the research group of Dr. A. A. Viggiano at the AFRL and supported by

Investigation of air gasification of micronized coal, mechanically activated using the plasma control of the process

NASA Astrophysics Data System (ADS)

Butakov, Evgenii; Burdukov, Anatoly; Chernetskiy, Mikhail; Kuznetsov, Victor

2017-10-01

Combination of the processes of coal combustion and gasification into a single technology of mechano-chemical and plasma-chemical activation is of a considerable scientific and technological interest. Enhancement of coal reactivity at their grinding with mechanical activation is associated with an increase in the reaction rate of carbon material, and at plasma-chemical effect, the main is an increase in reactivity of the oxidizing agent caused by the high plasma temperatures of atomic oxygen. The process of gasification was studied on the 1-MW setup with tangential scroll supply of pulverized coal-air mixture and cylindrical reaction chamber. Coal ground by the standard boiler mill is fed to the disintegrator, then, it is sent to the scroll inlet of the burner-reactor with the transport air. Pulverized coal is ignited by the plasmatron of 10-kW power. In experiments on air gasification of micronized coal, carried out at the temperature in the reaction chamber of 1000-1200°C and air excess α = 0.3-1, the data on CO concentration of 11% and H2 concentration of up to 6% were obtained. Air and air-steam gasification of mechanically-activated micronized coals with plasma control was calculated using SigmaFlow software package.

Recent advances in ultrafast-laser-based spectroscopy and imaging for reacting plasmas and flames

NASA Astrophysics Data System (ADS)

Patnaik, Anil K.; Adamovich, Igor; Gord, James R.; Roy, Sukesh

2017-10-01

Reacting flows and plasmas are prevalent in a wide array of systems involving defense, commercial, space, energy, medical, and consumer products. Understanding the complex physical and chemical processes involving reacting flows and plasmas requires measurements of key parameters, such as temperature, pressure, electric field, velocity, and number densities of chemical species. Time-resolved measurements of key chemical species and temperature are required to determine kinetics related to the chemical reactions and transient phenomena. Laser-based, noninvasive linear and nonlinear spectroscopic approaches have proved to be very valuable in providing key insights into the physico-chemical processes governing reacting flows and plasmas as well as validating numerical models. The advent of kilohertz rate amplified femtosecond lasers has expanded the multidimensional imaging of key atomic species such as H, O, and N in a significant way, providing unprecedented insight into preferential diffusion and production of these species under chemical reactions or electric-field driven processes. These lasers not only provide 2D imaging of chemical species but have the ability to perform measurements free of various interferences. Moreover, these lasers allow 1D and 2D temperature-field measurements, which were quite unimaginable only a few years ago. The rapid growth of the ultrafast-laser-based spectroscopic measurements has been fueled by the need to achieve the following when measurements are performed in reacting flows and plasmas. They are: (1) interference-free measurements (collision broadening, photolytic dissociation, Stark broadening, etc), (2) time-resolved single-shot measurements at a rate of 1-10 kHz, (3) spatially-resolved measurements, (4) higher dimensionality (line, planar, or volumetric), and (5) simultaneous detection of multiple species. The overarching goal of this article is to review the current state-of-the-art ultrafast-laser-based spectroscopic techniques and their remarkable development in the past two decades in meeting one or all of the above five goals for the spectroscopic measurement of temperature, number density of the atomic and molecular species, and electric field.

40 CFR 98.90 - Definition of the source category.

Code of Federal Regulations, 2012 CFR

2012-07-01

... uses plasma-generated fluorine atoms and other reactive fluorine-containing fragments, that chemically... thin films are cleaned periodically using plasma-generated fluorine atoms and other reactive fluorine-containing fragments. (3) Any electronics production process in which wafers are cleaned using plasma...

40 CFR 98.90 - Definition of the source category.

Code of Federal Regulations, 2011 CFR

2011-07-01

... uses plasma-generated fluorine atoms and other reactive fluorine-containing fragments, that chemically... thin films are cleaned periodically using plasma-generated fluorine atoms and other reactive fluorine-containing fragments. (3) Any electronics production process in which wafers are cleaned using plasma...

40 CFR 98.90 - Definition of the source category.

Code of Federal Regulations, 2013 CFR

2013-07-01

... uses plasma-generated fluorine atoms and other reactive fluorine-containing fragments, that chemically... thin films are cleaned periodically using plasma-generated fluorine atoms and other reactive fluorine-containing fragments. (3) Any electronics production process in which wafers are cleaned using plasma...

40 CFR 98.90 - Definition of the source category.

Code of Federal Regulations, 2014 CFR

2014-07-01

... uses plasma-generated fluorine atoms and other reactive fluorine-containing fragments, that chemically... thin films are cleaned periodically using plasma-generated fluorine atoms and other reactive fluorine-containing fragments. (3) Any electronics production process in which wafers are cleaned using plasma...

Argon–germane in situ plasma clean for reduced temperature Ge on Si epitaxy by high density plasma chemical vapor deposition

DOE PAGES

Douglas, Erica A.; Sheng, Josephine J.; Verley, Jason C.; ...

2015-06-04

We found that the demand for integration of near infrared optoelectronic functionality with silicon complementary metal oxide semiconductor (CMOS) technology has for many years motivated the investigation of low temperature germanium on silicon deposition processes. Our work describes the development of a high density plasma chemical vapor deposition process that uses a low temperature (<460 °C) in situ germane/argon plasma surface preparation step for epitaxial growth of germanium on silicon. It is shown that the germane/argon plasma treatment sufficiently removes SiO x and carbon at the surface to enable germanium epitaxy. Finally, the use of this surface preparation step demonstratesmore » an alternative way to produce germanium epitaxy at reduced temperatures, a key enabler for increased flexibility of integration with CMOS back-end-of-line fabrication.« less

The Synergistic Effect between Electrical and Chemical Factors in Plasma Gene/Molecule-Transfection

NASA Astrophysics Data System (ADS)

Jinno, Masafumi

2016-09-01

This study has been done to know what kind of factors in plasma and processes on cells promote plasma gene/molecule transfection. We have discovered a new plasma source using a microcapillary electrode which enables high transfection efficiency and high cell survivability simultaneously. However, the mechanism of the transfection by plasma was not clear. To clarify the transfection mechanisms by micro plasma, we focused on the effects of electrical (current, charge, field, etc.) and chemical (radicals, RONS, etc.) factors generated by the micro plasma and evaluated the contribution weight of three groups of the effects and processes, i.e. electrical, chemical and biochemical ones. At first, the necessity of the electrical factors was estimated by the laser produced plasma (LPP). Mouse L-929 fibroblast cell was cultured on a 96-well plate or 12-well micro slide chamber. Plasmids pCX-EGFP in Tris-EDTA buffer was dropped on the cells and they were exposed to the capillary discharge plasma (CDP) or the LPP. In the case of the CDP, the plasma was generated between the tip of the capillary electrode and the cells so that both electrical and chemical factors were supplied to the cells. In this setup, about 20% of average transfection efficiency was obtained. In the case of the LPP, the plasma was generated apart from the cells so that electrical factors were not supplied to the cells. In this setup, no transfection was observed. These results show that the electrical factors are necessary for the plasma gene transfection. Next, the necessity of the chemical factors was estimated the effect of catalase to remove H2O2 in CDP. The transfection efficiency decreased to 0.4 by scavenging H2O2 with catalase. However, only the solution of H2O2 caused no gene transfection in cells. These results shows that H2O2 is important species to cause gene/molecule transfection but still needs a synergistic effect with electrical or other chemical factors. This work was partly supported by Grants-in-Aid for Scientific Research (25108509 and 15H00896) from JSPS and a grant from Ehime University. The plasmids are prepared by ADRES Shigenobu of Ehime University.

Review of the methods to form hydrogen peroxide in electrical discharge plasma with liquid water

NASA Astrophysics Data System (ADS)

Locke, Bruce R.; Shih, Kai-Yuan

2011-06-01

This paper presents a review of the literature dealing with the formation of hydrogen peroxide from plasma processes. Energy yields for hydrogen peroxide generation by plasma from water span approximately three orders of magnitude from 4 × 10-2 to 80 g kWh-1. A wide range of plasma processes from rf to pulsed, ac, and dc discharges directly in the liquid phase have similar energy yields and may thus be limited by radical quenching processes at the plasma-liquid interface. Reactor modification using discharges in bubbles and discharges over the liquid phase can provide modest improvements in energy yield over direct discharge in the liquid, but the interpretation is complicated by additional chemical reactions of gas phase components such as ozone and nitrogen oxides. The highest efficiency plasma process utilizes liquid water droplets that may enhance efficiency by sequestering hydrogen peroxide in the liquid and by suppressing decomposition reactions by radicals from the gas and at the interface. Kinetic simulations of water vapor reported in the literature suggest that plasma generation of hydrogen peroxide should approach 45% of the thermodynamics limit, and this fact coupled with experimental studies demonstrating improvements with the presence of the condensed liquid phase suggest that further improvements in energy yield may be possible. Plasma generation of hydrogen peroxide directly from water compares favorably with a number of other methods including electron beam, ultrasound, electrochemical and photochemical methods, and other chemical processes.

Elimination of dimethyl methylphosphonate by plasma flame made of microwave plasma and burning hydrocarbon fuel

NASA Astrophysics Data System (ADS)

Cho, S. C.; Uhm, H. S.; Hong, Y. C.; Park, Y. G.; Park, J. S.

2008-06-01

Elimination of dimethyl methylphosphonate (DMMP) in liquid phase was studied by making use of a microwave plasma burner, exhibiting a safe removal capability of stockpiled chemical weapons. The microwave plasma burner consisted of a fuel injector and a plasma flame exit connected in series to a microwave plasma torch. The burner flames were sustained by injecting hydrocarbon fuels into the microwave plasma torch in air discharge. The Fourier transform infrared spectra indicated near perfect elimination of DMMP in the microwave plasma burner. This was confirmed by gas chromatography spectra as supporting data, revealing the disappearance of even intermediary compounds in the process of DMMP destruction. The experimental results and the physical configuration of the microwave plasma burner may provide an effective means of on-site removal of chemical warfare agents found on a battlefield.

Plasma variables and tribological properties of coatings in low pressure (0.1 - 10.0 torr) plasma systems

NASA Technical Reports Server (NTRS)

Avni, R.; Spalvins, T.

1984-01-01

A detailed treatment is presented of the dialog known as plasma surface interactions (PSI) with respect to the coating process and its tribological behavior. Adsorption, morphological changes, defect formation, sputtering, chemical etching, and secondary electron emission are all discussed as promoting and enhancing the surface chemistry, thus influencing the tribological properties of the deposited flux. Phenomenological correlations of rate of deposition, flux composition, microhardness, and wear with the plasma layer variables give an insight to the formation of chemical bonding between the deposited flux and the substrate surface.

Improving the work function of the niobium surface of SRF cavities by plasma processing

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tyagi, P. V.; Doleans, M.; Hannah, B.

2016-01-01

An in situ plasma processing technique using chemically reactive oxygen plasma to remove hydrocarbons from superconducting radio frequency cavity surfaces at room temperature was developed at the spallation neutron source, at Oak Ridge National Laboratory. To understand better the interaction between the plasma and niobium surface, surface studies on small samples were performed. In this article, we report the results from those surface studies. The results show that plasma processing removes hydrocarbons from top surface and improves the surface work function by 0.5₋1.0 eV. Improving the work function of RF surface of cavities can help to improve their operational performance.

EDITORIAL: Non-thermal plasma-assisted fuel conversion for green chemistry Non-thermal plasma-assisted fuel conversion for green chemistry

NASA Astrophysics Data System (ADS)

Nozaki, Tomohiro; Gutsol, Alexander

2011-07-01

This special issue is based on the symposium on Non-thermal Plasma Assisted Fuel Conversion for Green Chemistry, a part of the 240th ACS National Meeting & Exposition held in Boston, MA, USA, 22-26 August 2010. Historically, the Division of Fuel Chemistry of the American Chemical Society (ACS) has featured three plasma-related symposia since 2000, and has launched special issues in Catalysis Today on three occasions: 'Catalyst Preparation using Plasma Technologies', Fall Meeting, Washington DC, USA, 2000. Special issue in Catalysis Today 72 (3-4) with 12 peer-reviewed articles. 'Plasma Technology and Catalysis', Spring Meeting, New Orleans, LA, USA, 2003. Special issue in Catalysis Today 89 (1-2) with more than 30 peer-reviewed articles. 'Utilization of Greenhouse Gases II' (partly focused on plasma-related technologies), Spring Meeting, Anaheim, CA, USA, 2004. Special issue in Catalysis Today 98 (4) with 25 peer-reviewed articles. This time, selected presentations are published in this Journal of Physics D: Applied Physics special issue. An industrial material and energy conversion technology platform is established on thermochemical processes including various catalytic reactions. Existing industry-scale technology is already well established; nevertheless, further improvement in energy efficiency and material saving has been continuously demanded. Drastic reduction of CO2 emission is also drawing keen attention with increasing recognition of energy and environmental issues. Green chemistry is a rapidly growing research field, and frequently highlights renewable bioenergy, bioprocesses, solar photocatalysis of water splitting, and regeneration of CO2 into useful chemicals. We would also like to emphasize 'plasma catalysis' of hydrocarbon resources as an important part of the innovative next-generation green technologies. The peculiarity of non-thermal plasma is that it can generate reactive species almost independently of reaction temperature. Plasma-generated reactive species are used to initiate chemical reactions at unexpectedly lower temperatures than conventional thermochemical reactions, leading to non-equilibrium product distribution or creating unconventional reaction pathways. When non-thermal plasma is combined with catalysts, a synergistic effect is frequently observed. Such unique properties of non-thermal plasma are expected to contribute excellent control over process parameters that meet the need for energy saving, environment protection, and material preservation. This special issue consists of eleven peer-reviewed papers including two invited publications. Professors Alexander Fridman and Alexander Rabinovich from Drexel University, and Dr Gutsol from the Chevron Energy Technology Company present a critical review of various industry-oriented practical plasma fuel conversion processes. Professor Richard Mallinson from University of Oklahoma describes his recent project on E85 (85%-ethanol/15%-gasoline) upgrading using non-thermal plasma and catalyst hybrid reactor, and highlights the synergistic effect on fuel conversion processes. Other papers focus on plasma/catalyst hybrid reactions for methane dry (CO2) reforming, plasma synthesis of carbon suboxide polymer from CO, the gas-to-liquid (GTL) process using a non-thermal plasma-combined micro-chemical reactor, and molecular beam characterization of plasma-generated reactive species. Much research regarding plasma catalysis is ongoing worldwide, but there is plenty of room for further development of plasma fuel processing, which could eventually provide a viable and flexible solution in future energy and material use. Finally, we would like to thank all symposium participants for their active discussion. We appreciate the sponsorship of the Division of Fuel Chemistry of the American Chemical Society. We express special thanks to the program chair of the Fuel Chemistry Division, Professor Chang-jun Liu at Tianjin University, for his dedication to the success of the symposium. We particularly express our appreciation to the Editorial Board of Journal of Physics D: Applied Physics for publication of the special issue.

PumpKin: A tool to find principal pathways in plasma chemical models

NASA Astrophysics Data System (ADS)

Markosyan, A. H.; Luque, A.; Gordillo-Vázquez, F. J.; Ebert, U.

2014-10-01

PumpKin is a software package to find all principal pathways, i.e. the dominant reaction sequences, in chemical reaction systems. Although many tools are available to integrate numerically arbitrarily complex chemical reaction systems, few tools exist in order to analyze the results and interpret them in relatively simple terms. In particular, due to the large disparity in the lifetimes of the interacting components, it is often useful to group reactions into pathways that recycle the fastest species. This allows a researcher to focus on the slow chemical dynamics, eliminating the shortest timescales. Based on the algorithm described by Lehmann (2004), PumpKin automates the process of finding such pathways, allowing the user to analyze complex kinetics and to understand the consumption and production of a certain species of interest. We designed PumpKin with an emphasis on plasma chemical systems but it can also be applied to atmospheric modeling and to industrial applications such as plasma medicine and plasma-assisted combustion.

Research Activities at Plasma Research Laboratory at NASA Ames Research Center

NASA Technical Reports Server (NTRS)

Sharma, S. P.; Rao, M. V. V. S.; Meyyappan, Meyya

2000-01-01

In order to meet NASA's requirements for the rapid development and validation of future generation electronic devices as well as associated materials and processes, enabling technologies are being developed at NASA-Ames Research Center using a multi-discipline approach. The first step is to understand the basic physics of the chemical reactions in the area of plasma reactors and processes. Low pressure glow discharges are indispensable in the fabrication of microelectronic circuits. These plasmas are used to deposit materials and also etch fine features in device fabrication. However, many plasma-based processes suffer from stability and reliability problems leading to a compromise in performance and a potentially increased cost for the semiconductor manufacturing industry. Although a great deal of laboratory-scale research has been performed on many of these processing plasmas, little is known about the gas-phase and surface chemical reactions that are critical in many etch and deposition processes, and how these reactions are influenced by the variation in operating conditions. Such a lack of understanding has hindered the development of process models that can aid in the scaling and improvement of plasma etch and deposition systems. Our present research involves the study of such plasmas. An inductively-coupled plasma (ICP) source in place of the standard upper electrode assembly of the Gaseous Electronics Conference (GEC) radio-frequency (RF) Reference Cell is used to investigate the discharge characteristics. This ICP source generates plasmas with higher electron densities and lower operating pressures than obtainable with the original parallel-plate version of the GEC Cell. This expanded operating regime is more relevant to new generations of industrial plasma systems being used by the microelectronics industry. The research goal is to develop an understanding of the physical phenomena involved in plasma processing and to measure much needed fundamental parameters, such as gas phase and surface reaction rates, species concentration, temperature, ion energy distribution, and electron number density.

Formation of Nitrogen Oxides in an Apokamp-Type Plasma Source

NASA Astrophysics Data System (ADS)

Sosnin, É. A.; Goltsova, P. A.; Panarin, V. A.; Skakun, V. S.; Tarasenko, V. F.; Didenko, M. V.

2017-08-01

Using optical and chemical processes, the composition of the products of decay of the atmospheric-pressure non-equilibrium plasma is determined in a pulsed, high-voltage discharge in the modes of apokampic and corona discharges. It is shown that the products of decay primarily contain nitrogen oxides NO x, and in the mode of the corona discharge - ozone. Potential applications of this source of plasma are discussed with respect to plasma processing of the seeds of agricultural crops.

Growth of vertically aligned carbon nanofibers by low-pressure inductively coupled plasma-enhanced chemical vapor deposition

NASA Astrophysics Data System (ADS)

Caughman, J. B. O.; Baylor, L. R.; Guillorn, M. A.; Merkulov, V. I.; Lowndes, D. H.; Allard, L. F.

2003-08-01

Vertically aligned carbon nanofibers (VACNFs) have been grown using a low-pressure, plasma-enhanced, chemical vapor deposition process. The nanofibers are grown from a nickel catalyst that can be patterned to form arrays of individual, isolated VACNFs. The fibers are grown at pressures below 100 mTorr, using an inductively coupled plasma source with a radio-frequency bias on the sample substrate to allow for independent control of the ion energies. Plasma conditions are related to growth results by comparing optical emission from the plasma to the physical structure of the nanofibers. We find that the ratio of etching species in the plasma to depositing species is critical to the final shape of the carbon structures that are formed.

Plasma Processes for Semiconductor Fabrication

NASA Astrophysics Data System (ADS)

Hitchon, W. N. G.

1999-01-01

Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practicing engineers in the semiconductor industry.

Silicon solar cells made by a self-aligned, selective-emitter, plasma-etchback process

DOEpatents

Ruby, Douglas S.; Schubert, William K.; Gee, James M.

1999-01-01

A potentially low-cost process for forming and passivating a selective emitter. The process uses a plasma etch of the heavily doped emitter to improve its performance. The grids of the solar cell are used to mask the plasma etch so that only the emitter in the region between the grids is etched, while the region beneath the grids remains heavily doped for low contact resistance. This process is potentially low-cost because it requires no alignment. After the emitter etch, a silicon nitride layer is deposited by plasma-enhanced, chemical vapor deposition, and the solar cell is annealed in a forming gas.

Silicon solar cells made by a self-aligned, selective-emitter, plasma-etchback process

DOEpatents

Ruby, D.S.; Schubert, W.K.; Gee, J.M.

1999-02-16

A potentially low-cost process for forming and passivating a selective emitter. The process uses a plasma etch of the heavily doped emitter to improve its performance. The grids of the solar cell are used to mask the plasma etch so that only the emitter in the region between the grids is etched, while the region beneath the grids remains heavily doped for low contact resistance. This process is potentially low-cost because it requires no alignment. After the emitter etch, a silicon nitride layer is deposited by plasma-enhanced, chemical vapor deposition, and the solar cell is annealed in a forming gas. 5 figs.

Development of plasma chemical vaporization machining

NASA Astrophysics Data System (ADS)

Mori, Yuzo; Yamauchi, Kazuto; Yamamura, Kazuya; Sano, Yasuhisa

2000-12-01

Conventional machining processes, such as turning, grinding, or lapping are still applied for many materials including functional ones. But those processes are accompanied with the formation of a deformed layer, so that machined surfaces cannot perform their original functions. In order to avoid such points, plasma chemical vaporization machining (CVM) has been developed. Plasma CVM is a chemical machining method using neutral radicals, which are generated by the atmospheric pressure plasma. By using a rotary electrode for generation of plasma, a high density of neutral radicals was formed, and we succeeded in obtaining high removal rate of several microns to several hundred microns per minute for various functional materials such as fused silica, single crystal silicon, molybdenum, tungsten, silicon carbide, and diamond. Especially, a high removal rate equal to lapping in the mechanical machining of fused silica and silicon was realized. 1.4 nm (p-v) was obtained as a surface roughness in the case of machining a silicon wafer. The defect density of a silicon wafer surface polished by various machining method was evaluated by the surface photo voltage spectroscopy. As a result, the defect density of the surface machined by plasma CVM was under 1/100 in comparison with the surface machined by mechanical polishing and argon ion sputtering, and very low defect density which was equivalent to the chemical etched surface was realized. A numerically controlled CVM machine for x-ray mirror fabrication is detailed in the accompanying article in this issue.

Using atmospheric pressure plasma treatment for treating grey cotton fabric.

PubMed

Kan, Chi-Wai; Lam, Chui-Fung; Chan, Chee-Kooi; Ng, Sun-Pui

2014-02-15

Conventional wet treatment, desizing, scouring and bleaching, for grey cotton fabric involves the use of high water, chemical and energy consumption which may not be considered as a clean process. This study aims to investigate the efficiency of the atmospheric pressure plasma (APP) treatment on treating grey cotton fabric when compared with the conventional wet treatment. Grey cotton fabrics were treated with different combinations of plasma parameters with helium and oxygen gases and also through conventional desizing, scouring and bleaching processes in order to obtain comparable results. The results obtained from wicking and water drop tests showed that wettability of grey cotton fabrics was greatly improved after plasma treatment and yielded better results than conventional desizing and scouring. The weight reduction of plasma treated grey cotton fabrics revealed that plasma treatment can help remove sizing materials and impurities. Chemical and morphological changes in plasma treated samples were analysed by FTIR and SEM, respectively. Finally, dyeability of the plasma treated and conventional wet treated grey cotton fabrics was compared and the results showed that similar dyeing results were obtained. This can prove that plasma treatment would be another choice for treating grey cotton fabrics. Copyright © 2013 Elsevier Ltd. All rights reserved.

Laser-induced plasma chemistry of the explosive RDX with various metallic nanoparticles.

PubMed

Gottfried, Jennifer L

2012-03-01

The feasibility of exploiting plasma chemistry to study the chemical reactions between metallic nanoparticles and molecular explosives such as cyclotrimethylenetrinitramine (RDX) has been demonstrated. This method, based on laser-induced breakdown spectroscopy, involves the production of nanoparticles in a laser-induced plasma and the simultaneous observation of time-resolved atomic and molecular emission characteristic of the species involved in the intermediate chemical reactions of the nanoenergetic material in the plasma. Using this method, it has been confirmed that the presence of aluminum promotes the ejection process of carbon from the intermediate products of RDX. The time evolution of species formation, the effects of laser pulse energy, and the effects of trace metal content on the chemical reactions were also studied. © 2012 Optical Society of America

Nanoscale plasma chemistry enables fast, size-selective nanotube nucleation.

PubMed

Ostrikov, Kostya Ken; Mehdipour, Hamid

2012-03-07

The possibility of fast, narrow-size/chirality nucleation of thin single-walled carbon nanotubes (SWCNTs) at low, device-tolerant process temperatures in a plasma-enhanced chemical vapor deposition (CVD) is demonstrated using multiphase, multiscale numerical experiments. These effects are due to the unique nanoscale reactive plasma chemistry (NRPC) on the surfaces and within Au catalyst nanoparticles. The computed three-dimensional process parameter maps link the nanotube incubation times and the relative differences between the incubation times of SWCNTs of different sizes/chiralities to the main plasma- and precursor gas-specific parameters and explain recent experimental observations. It is shown that the unique NRPC leads not only to much faster nucleation of thin nanotubes at much lower process temperatures, but also to better selectivity between the incubation times of SWCNTs with different sizes and chiralities, compared to thermal CVD. These results are used to propose a time-programmed kinetic approach based on fast-responding plasmas which control the size-selective, narrow-chirality nucleation and growth of thin SWCNTs. This approach is generic and can be used for other nanostructure and materials systems. © 2012 American Chemical Society

The Chemical Potential of Plasma Membrane Cholesterol: Implications for Cell Biology.

PubMed

Ayuyan, Artem G; Cohen, Fredric S

2018-02-27

Cholesterol is abundant in plasma membranes and exhibits a variety of interactions throughout the membrane. Chemical potential accounts for thermodynamic consequences of molecular interactions, and quantifies the effective concentration (i.e., activity) of any substance participating in a process. We have developed, to our knowledge, the first method to measure cholesterol chemical potential in plasma membranes. This was accomplished by complexing methyl-β-cyclodextrin with cholesterol in an aqueous solution and equilibrating it with an organic solvent containing dissolved cholesterol. The chemical potential of cholesterol was thereby equalized in the two phases. Because cholesterol is dilute in the organic phase, here activity and concentration were equivalent. This equivalence allowed the amount of cholesterol bound to methyl-β-cyclodextrin to be converted to cholesterol chemical potential. Our method was used to determine the chemical potential of cholesterol in erythrocytes and in plasma membranes of nucleated cells in culture. For erythrocytes, the chemical potential did not vary when the concentration was below a critical value. Above this value, the chemical potential progressively increased with concentration. We used standard cancer lines to characterize cholesterol chemical potential in plasma membranes of nucleated cells. This chemical potential was significantly greater for highly metastatic breast cancer cells than for nonmetastatic breast cancer cells. Chemical potential depended on density of the cancer cells. A method to alter and fix the cholesterol chemical potential to any value (i.e., a cholesterol chemical potential clamp) was also developed. Cholesterol content did not change when cells were clamped for 24-48 h. It was found that the level of activation of the transcription factor STAT3 increased with increasing cholesterol chemical potential. The cholesterol chemical potential may regulate signaling pathways. Copyright © 2018. Published by Elsevier Inc.

Chemical reaction and dust formation studies in laboratory hydrocarbon plasmas.

NASA Astrophysics Data System (ADS)

Hippler, Rainer; Majumdar, Abhijit; Thejaswini, H. C.

Plasma chemical reaction studies with relevance to, e.g., Titan's atmosphere have been per-formed in various laboratory plasmas [1,2]. Chemical reactions in a dielectric barrier discharge at medium pressure of 250-300 mbar have been studied in CH4 /N2 and CH4 /Ar gas mixtures by means of mass spectrometry. The main reaction scheme is production of H2 by fragmenta-tion of CH4 , but also production of larger hydrocarbons like Cn Hm with n up to 10 including formation of different functional CN groups is observed. [1] A. Majumdar and R. Hippler, Development of dielectric barrier discharge plasma processing apparatus for mass spectrometry and thin film deposition, Rev. Sci. Instrum. 78, 075103 (2007) [2] H.T. Do, G. Thieme, M. Frühlich, H. Kersten, and R. Hippler, Ion Molecule and Dust Particle Formation in Ar/CH4 , Ar/C2 H2 and Ar/C3 H6 Radio-frequency Plasmas, Contrib. Plasma Phys. 45, No. 5-6, 378-384 (2005)

Direct fabrication of 3D graphene on nanoporous anodic alumina by plasma-enhanced chemical vapor deposition

PubMed Central

Zhan, Hualin; Garrett, David J.; Apollo, Nicholas V.; Ganesan, Kumaravelu; Lau, Desmond; Prawer, Steven; Cervenka, Jiri

2016-01-01

High surface area electrode materials are of interest for a wide range of potential applications such as super-capacitors and electrochemical cells. This paper describes a fabrication method of three-dimensional (3D) graphene conformally coated on nanoporous insulating substrate with uniform nanopore size. 3D graphene films were formed by controlled graphitization of diamond-like amorphous carbon precursor films, deposited by plasma-enhanced chemical vapour deposition (PECVD). Plasma-assisted graphitization was found to produce better quality graphene than a simple thermal graphitization process. The resulting 3D graphene/amorphous carbon/alumina structure has a very high surface area, good electrical conductivity and exhibits excellent chemically stability, providing a good material platform for electrochemical applications. Consequently very large electrochemical capacitance values, as high as 2.1 mF for a sample of 10 mm3, were achieved. The electrochemical capacitance of the material exhibits a dependence on bias voltage, a phenomenon observed by other groups when studying graphene quantum capacitance. The plasma-assisted graphitization, which dominates the graphitization process, is analyzed and discussed in detail. PMID:26805546

RETRACTED: Chemical densification of plasma sprayed yttria stabilized zirconia (YSZ) coatings for high temperature wear and corrosion resistance

NASA Astrophysics Data System (ADS)

Ye, Yaping; Fehr, Karl Thomas; Faulstich, Martin; Wolf, Gerhard

2012-12-01

Plasma-sprayed yttria stabilized zirconia (YSZ) ceramic coatings have been widely used as wear- and corrosion-resistant coatings in high temperature applications and an aggressive environment due to their high hardness, wear resistance, heat and chemical resistance, and low thermal conductivity. The highly porous structure of plasma-sprayed ceramic coatings and their poor adhesion to the substrate usually lead to the coating degradation and failure. In this study, a two-layer system consisting of atmospheric plasma-sprayed 8 wt.% yttria-stabilized zirconia (8YSZ) and Ni-based alloy coatings was post-treated by means of a novel chemical sealing process at moderate temperatures of 600-800 °C. Microstructure characteristics of the YSZ coatings were studied using an electron probe micro-analyzer (EPMA). Results revealed that the ceramic top coat was densified by the precipitated zirconia in the open pores. Therefore, the sealed YSZ coatings exhibit reduced porosity, higher hardness and a better adhesion onto the bond coat. The mechanisms for the sealing process were also proposed.

Direct fabrication of 3D graphene on nanoporous anodic alumina by plasma-enhanced chemical vapor deposition.

PubMed

Zhan, Hualin; Garrett, David J; Apollo, Nicholas V; Ganesan, Kumaravelu; Lau, Desmond; Prawer, Steven; Cervenka, Jiri

2016-01-25

High surface area electrode materials are of interest for a wide range of potential applications such as super-capacitors and electrochemical cells. This paper describes a fabrication method of three-dimensional (3D) graphene conformally coated on nanoporous insulating substrate with uniform nanopore size. 3D graphene films were formed by controlled graphitization of diamond-like amorphous carbon precursor films, deposited by plasma-enhanced chemical vapour deposition (PECVD). Plasma-assisted graphitization was found to produce better quality graphene than a simple thermal graphitization process. The resulting 3D graphene/amorphous carbon/alumina structure has a very high surface area, good electrical conductivity and exhibits excellent chemically stability, providing a good material platform for electrochemical applications. Consequently very large electrochemical capacitance values, as high as 2.1 mF for a sample of 10 mm(3), were achieved. The electrochemical capacitance of the material exhibits a dependence on bias voltage, a phenomenon observed by other groups when studying graphene quantum capacitance. The plasma-assisted graphitization, which dominates the graphitization process, is analyzed and discussed in detail.

Atmospheric-pressure electric discharge as an instrument of chemical activation of water solutions

NASA Astrophysics Data System (ADS)

Rybkin, V. V.; Shutov, D. A.

2017-11-01

Results of experimental studies and numerical simulations of physicochemical characteristics of plasmas generated in different types of atmospheric-pressure discharges (pulsed streamer corona, gliding electric arc, dielectric barrier discharge, glow-discharge electrolysis, diaphragmatic discharge, and dc glow discharge) used to initiate various chemical processes in water solutions are analyzed. Typical reactor designs are considered. Data on the power supply characteristics, plasma electron parameters, gas temperatures, and densities of active particles in different types of discharges excited in different gases and their dependences on the external parameters of discharges are presented. The chemical composition of active particles formed in water is described. Possible mechanisms of production and loss of plasma particles are discussed.

Plasma Processes of Cutting and Welding

DTIC Science & Technology

1976-02-01

TIG process. 2.2.2 Keyhole Welding In plasma arc welding , the term...Cutting 3 3 4 4 4 2.2 Plasma Arc Welding 5 2.2.1 Needle Arc Welding 2.2.2 Keyhole Welding 5 6 3. Applications 8 93.1 Economics 4. Environmental Aspects of...Arc Lengths III. Needle Arc Welding Conditions IV. Keyhole Welding Conditions v. Chemical Analyses of Plates Used - vii - 1. 2. 3. 4. 5. 6. 7. 8.

Plasma Spraying of Ceramics with Particular Difficulties in Processing

NASA Astrophysics Data System (ADS)

Mauer, G.; Schlegel, N.; Guignard, A.; Jarligo, M. O.; Rezanka, S.; Hospach, A.; Vaßen, R.

2015-01-01

Emerging new applications and growing demands of plasma-sprayed coatings initiate the development of new materials. Regarding ceramics, often complex compositions are employed to achieve advanced material properties, e.g., high thermal stability, low thermal conductivity, high electronic and ionic conductivity as well as specific thermo-mechanical properties and microstructures. Such materials however, often involve particular difficulties in processing by plasma spraying. The inhomogeneous dissociation and evaporation behavior of individual constituents can lead to changes of the chemical composition and the formation of secondary phases in the deposited coatings. Hence, undesired effects on the coating characteristics are encountered. In this work, examples of such challenging materials are investigated, namely pyrochlores applied for thermal barrier coatings as well as perovskites for gas separation membranes. In particular, new plasma spray processes like suspension plasma spraying and plasma spray-physical vapor deposition are considered. In some cases, plasma diagnostics are applied to analyze the processing conditions.

Plasma Jet Interactions with Liquids in Partial Fulfillment of an NRL Karles Fellowship

DTIC Science & Technology

2015-11-30

deposition), modify (e.g., chemical functionalization), and etch (in Si technology) materials. In low- pressure non- equilibrium discharge plasmas... equilibrium discharge plasmas, associated with the above processes, the electron population is much more energetic than both the ions and neutral gas...to be crucial to the advancements of these fields1, 2. Background: Atmospheric-pressure, non- equilibrium (APNE) plasmas, like low-pressure plasmas

Effect of plasma-induced surface charging on catalytic processes: application to CO2 activation

NASA Astrophysics Data System (ADS)

Bal, Kristof M.; Huygh, Stijn; Bogaerts, Annemie; Neyts, Erik C.

2018-02-01

Understanding the nature and effect of the multitude of plasma-surface interactions in plasma catalysis is a crucial requirement for further process development and improvement. A particularly intriguing and rather unique property of a plasma-catalytic setup is the ability of the plasma to modify the electronic structure, and hence chemical properties, of the catalyst through charging, i.e. the absorption of excess electrons. In this work, we develop a quantum chemical model based on density functional theory to study excess negative surface charges in a heterogeneous catalyst exposed to a plasma. This method is specifically applied to investigate plasma-catalytic CO2 activation on supported M/Al2O3 (M = Ti, Ni, Cu) single atom catalysts. We find that (1) the presence of a negative surface charge dramatically improves the reductive power of the catalyst, strongly promoting the splitting of CO2 to CO and oxygen, and (2) the relative activity of the investigated transition metals is also changed upon charging, suggesting that controlled surface charging is a powerful additional parameter to tune catalyst activity and selectivity. These results strongly point to plasma-induced surface charging of the catalyst as an important factor contributing to the plasma-catalyst synergistic effects frequently reported for plasma catalysis.

Investigation of Chemical Processes Involving Laser-generated Nanoenergetic Materials

DTIC Science & Technology

2010-02-01

nanoparticle formation, nanoenergetic materials, laser ablation, plasma chemistry , optical emission 16. SECURITY CLASSIFICATION OF: 17...alloys with known trace metal concentrations. In addition to observing the effect of trace metals on the plasma chemistry , commercially available

Plasma characterization studies for materials processing

DOE Office of Scientific and Technical Information (OSTI.GOV)

Pfender, E.; Heberlein, J.

New applications for plasma processing of materials require a more detailed understanding of the fundamental processes occurring in the processing reactors. We have developed reactors offering specific advantages for materials processing, and we are using modeling and diagnostic techniques for the characterization of these reactors. The emphasis is in part set by the interest shown by industry pursuing specific plasma processing applications. In this paper we report on the modeling of radio frequency plasma reactors for use in materials synthesis, and on the characterization of the high rate diamond deposition process using liquid precursors. In the radio frequency plasma torchmore » model, the influence of specific design changes such as the location of the excitation coil on the enthalpy flow distribution is investigated for oxygen and air as plasma gases. The diamond deposition with liquid precursors has identified the efficient mass transport in form of liquid droplets into the boundary layer as responsible for high growth, and the chemical properties of the liquid for the film morphology.« less

UV excimer laser and low temperature plasma treatments of polyamide materials

NASA Astrophysics Data System (ADS)

Yip, Yiu Wan Joanne

Polyamides have found widespread application in various industrial sectors, for example, they are used in apparel, home furnishings and similar uses. However, the requirements for high quality performance products are continually increasing and these promote a variety of surface treatments for polymer modification. UV excimer laser and low temperature plasma treatments are ideally suited for polyamide modification because they can change the physical and chemical properties of the material without affecting its bulk features. This project aimed to study the modification of polyamides by UV excimer laser irradiation and low temperature plasma treatment. The morphological changes in the resulting samples were analysed by scanning electron microscopy (SEM) and tapping mode atomic force microscopy (TM-AFM). The chemical modifications were studied by x-ray photoelectron spectroscopy (XPS), time-of-flight secondary ion mass spectrometry (ToF-SIMS) and chemical force microscopy (CFM). Change in degree of crystallinity was examined by differential scanning calorimetry (DSC). After high-fluence laser irradiation, topographical results showed that ripples of micrometer size form on the fibre surface. By contrast, sub-micrometer size structures form on the polyamide surface when the applied laser energy is well below its ablation threshold. After high-fluence laser irradiation, chemical studies showed that the surface oxygen content of polyamide is reduced. A reverse result is obtained with low-fluence treatment. The DSC result showed no significant change in degree of crystallinity in either high-fluence or low-fluence treated samples. The same modifications in polyamide surfaces were studied after low temperature plasma treatment with oxygen, argon or tetrafluoromethane gas. The most significant result was that the surface oxygen content of polyamide increased after oxygen and argon plasma treatments. Both treatments induced many hydroxyl (-OH) and carboxylic acid (-COOH) functional groups, which increased water absorption. However, after tetrafluoromethane plasma treatment it was found that the -CF, -CF2 and -CF3 groups were introduced to the polyamide surface and this enhanced the hydrophobicity of the fabric. Suggested explanations are given of the mechanisms that produce the structure of the polyamide after the processes of laser irradiation (both high- and low-fluence) and plasma treatment. The fundamental approach used in modelling was considered the temperature profile of the material during the treatment. The development of high-fluence induced structures was caused by elevated temperatures in the subsurface volume and preexisting stress caused by fiber extrusion. The structure formation under LF laser irradiation was determined by thermal effect accompanied by the optical phenomenon of interference. Ripple structures formed by plasma were closely related to physical or chemical etching. Possible applications of plasma and laser technologies in the textile and clothing industries are considered. Oxygen plasma seems to be the best candidate to improve the wettability of the fabric, while tetrafluoromethane plasma can be applied to produce a water repellent surface. Surface treatments including CF4 plasma, high-fluence and low-fluence laser treatments produce a deeper color in disperse dyed fabrics using the same amount of dyestuff as chemicals like leveling agents and dyestuff can be reduced during the textile manufacturing process. UV laser and low temperature plasma modification processes are promising techniques for polymer/fabric surface modification and have industrial potential as they are environmentally friendly dry processes which do not involve any solvents.

Cold plasma processing of local planetary ores for oxygen and metallurgically important metals

NASA Technical Reports Server (NTRS)

Lynch, D. C.; Bullard, D.; Ortega, R.

1990-01-01

The utilization of a cold plasma in chlorination processing is described. Essential equipment and instruments were received, the experimental apparatus assembled and tested, and preliminary experiments conducted. The results of the latter lend support to the original hypothesis: a cold plasma can both significantly enhance and bias chemical reactions. In two separate experiments, a cold plasma was used to reduce TiCl4 vapor and chlorinate ilmenite. The latter, reacted in an argon-chlorine plasma, yielded oxygen. The former experiment reveals that chlorine can be recovered as HCl vapor from metal chlorides in a hydrogen plasma. Furthermore, the success of the hydrogen experiments has lead to an analysis of the feasibility of direct hydrogen reduction of metal oxides in a cold plasma. That process would produce water vapor and numerous metal by-products.

Process for forming planarized films

DOEpatents

Pang, Stella W.; Horn, Mark W.

1991-01-01

A planarization process and apparatus which employs plasma-enhanced chemical vapor deposition (PECVD) to form plarnarization films of dielectric or conductive carbonaceous material on step-like substrates.

Vapor deposition of thin films

DOEpatents

Smith, David C.; Pattillo, Stevan G.; Laia, Jr., Joseph R.; Sattelberger, Alfred P.

1992-01-01

A highly pure thin metal film having a nanocrystalline structure and a process of preparing such highly pure thin metal films of, e.g., rhodium, iridium, molybdenum, tungsten, rhenium, platinum, or palladium by plasma assisted chemical vapor deposition of, e.g., rhodium(allyl).sub.3, iridium(allyl).sub.3, molybdenum(allyl).sub.4, tungsten(allyl).sub.4, rhenium(allyl).sub.4, platinum(allyl).sub.2, or palladium(allyl).sub.2 are disclosed. Additionally, a general process of reducing the carbon content of a metallic film prepared from one or more organometallic precursor compounds by plasma assisted chemical vapor deposition is disclosed.

Application of computational methods to analyse and investigate physical and chemical processes of high-temperature mineralizing of condensed substances in gas stream

NASA Astrophysics Data System (ADS)

Markelov, A. Y.; Shiryaevskii, V. L.; Kudrinskiy, A. A.; Anpilov, S. V.; Bobrakov, A. N.

2017-11-01

A computational method of analysis of physical and chemical processes of high-temperature mineralizing of low-level radioactive waste in gas stream in the process of plasma treatment of radioactive waste in shaft furnaces was introduced. It was shown that the thermodynamic simulation method allows fairly adequately describing the changes in the composition of the pyrogas withdrawn from the shaft furnace at different waste treatment regimes. This offers a possibility of developing environmentally and economically viable technologies and small-sized low-cost facilities for plasma treatment of radioactive waste to be applied at currently operating nuclear power plants.

Non-thermal plasma destruction of allyl alcohol in waste gas: kinetics and modelling

NASA Astrophysics Data System (ADS)

DeVisscher, A.; Dewulf, J.; Van Durme, J.; Leys, C.; Morent, R.; Van Langenhove, H.

2008-02-01

Non-thermal plasma treatment is a promising technique for the destruction of volatile organic compounds in waste gas. A relatively unexplored technique is the atmospheric negative dc multi-pin-to-plate glow discharge. This paper reports experimental results of allyl alcohol degradation and ozone production in this type of plasma. A new model was developed to describe these processes quantitatively. The model contains a detailed chemical degradation scheme, and describes the physics of the plasma by assuming that the fraction of electrons that takes part in chemical reactions is an exponential function of the reduced field. The model captured the experimental kinetic data to less than 2 ppm standard deviation.

Diagnostic for Plasma Enhanced Chemical Vapor Deposition and Etch Systems

NASA Technical Reports Server (NTRS)

Cappelli, Mark A.

1999-01-01

In order to meet NASA's requirements for the rapid development and validation of future generation electronic devices as well as associated materials and processes, enabling technologies ion the processing of semiconductor materials arising from understanding etch chemistries are being developed through a research collaboration between Stanford University and NASA-Ames Research Center, Although a great deal of laboratory-scale research has been performed on many of materials processing plasmas, little is known about the gas-phase and surface chemical reactions that are critical in many etch and deposition processes, and how these reactions are influenced by the variation in operating conditions. In addition, many plasma-based processes suffer from stability and reliability problems leading to a compromise in performance and a potentially increased cost for the semiconductor manufacturing industry. Such a lack of understanding has hindered the development of process models that can aid in the scaling and improvement of plasma etch and deposition systems. The research described involves the study of plasmas used in semiconductor processes. An inductively coupled plasma (ICP) source in place of the standard upper electrode assembly of the Gaseous Electronics Conference (GEC) radio-frequency (RF) Reference Cell is used to investigate the discharge characteristics and chemistries. This ICP source generates plasmas with higher electron densities (approximately 10(exp 12)/cu cm) and lower operating pressures (approximately 7 mTorr) than obtainable with the original parallel-plate version of the GEC Cell. This expanded operating regime is more relevant to new generations of industrial plasma systems being used by the microelectronics industry. The motivation for this study is to develop an understanding of the physical phenomena involved in plasma processing and to measure much needed fundamental parameters, such as gas-phase and surface reaction rates. species concentration, temperature, ion energy distribution, and electron number density. A wide variety of diagnostic techniques are under development through this consortium grant to measure these parameters. including molecular beam mass spectrometry (MBMS). Fourier transform infrared (FTIR) spectroscopy, broadband ultraviolet (UV) absorption spectroscopy, a compensated Langmuir probe. Additional diagnostics. Such as microwave interferometry and microwave absorption for measurements of plasma density and radical concentrations are also planned.

Studies and comparison of currently utilized models for ablation in Electrothermal-chemical guns

NASA Astrophysics Data System (ADS)

Jia, Shenli; Li, Rui; Li, Xingwen

2009-10-01

Wall ablation is a key process taking place in the capillary plasma generator in Electrothermal-Chemical (ETC) guns, whose characteristic directly decides the generator's performance. In the present article, this ablation process is theoretically studied. Currently widely used mathematical models designed to describe such process are analyzed and compared, including a recently developed kinetic model which takes into account the unsteady state in plasma-wall transition region by dividing it into two sub-layers, a Knudsen layer and a collision dominated non-equilibrium Hydrodynamic layer, a model based on Langmuir Law, as well as a simplified model widely used in arc-wall interaction process in circuit breakers, which assumes a proportional factor and an ablation enthalpy obtained empirically. Bulk plasma state and parameters are assumed to be consistent while analyzing and comparing each model, in order to take into consideration only the difference caused by model itself. Finally ablation rate is calculated in each method respectively and differences are discussed.

Isotropic plasma etching of Ge Si and SiN x films

DOE PAGES

Henry, Michael David; Douglas, Erica Ann

2016-08-31

This study reports on selective isotropic dry etching of chemically vapor deposited (CVD) Ge thin film, release layers using a Shibaura chemical downstream etcher (CDE) with NF 3 and Ar based plasma chemistry. Relative etch rates between Ge, Si and SiN x are described with etch rate reductions achieved by adjusting plasma chemistry with O 2. Formation of oxides reducing etch rates were measured for both Ge and Si, but nitrides or oxy-nitrides created using direct injection of NO into the process chamber were measured to increase Si and SiN x etch rates while retarding Ge etching.

Decontamination of foods by cold plasma

USDA-ARS?s Scientific Manuscript database

Cold plasma is a novel nonthermal food processing technology for meats, poultry, fruits, and vegetables. This flexible sanitizing method uses electricity and a carrier gas, such as air, oxygen, nitrogen, or helium to inactivate microbes without the use of conventional antimicrobial chemical agents. ...

Destruction of chemical warfare surrogates using a portable atmospheric pressure plasma jet

NASA Astrophysics Data System (ADS)

Škoro, Nikola; Puač, Nevena; Živković, Suzana; Krstić-Milošević, Dijana; Cvelbar, Uroš; Malović, Gordana; Petrović, Zoran Lj.

2018-01-01

Today's reality is connected with mitigation of threats from the new chemical and biological warfare agents. A novel investigation of cold plasmas in contact with liquids presented in this paper demonstrated that the chemically reactive environment produced by atmospheric pressure plasma jet (APPJ) is potentially capable of rapid destruction of chemical warfare agents in a broad spectrum. The decontamination of three different chemical warfare agent surrogates dissolved in liquid is investigated by using an easily transportable APPJ. The jet is powered by a kHz signal source connected to a low-voltage DC source and with He as working gas. The detailed investigation of electrical properties is performed for various plasmas at different distances from the sample. The measurements of plasma properties in situ are supported by the optical spectrometry measurements, whereas the high performance liquid chromatography measurements before and after the treatment of aqueous solutions of Malathion, Fenitrothion and Dimethyl Methylphosphonate. These solutions are used to evaluate destruction and its efficiency for specific neural agent simulants. The particular removal rates are found to be from 56% up to 96% during 10 min treatment. The data obtained provide basis to evaluate APPJ's efficiency at different operating conditions. The presented results are promising and could be improved with different operating conditions and optimization of the decontamination process.

Dry-plasma-free chemical etch technique for variability reduction in multi-patterning (Conference Presentation)

NASA Astrophysics Data System (ADS)

Kal, Subhadeep; Mohanty, Nihar; Farrell, Richard A.; Franke, Elliott; Raley, Angelique; Thibaut, Sophie; Pereira, Cheryl; Pillai, Karthik; Ko, Akiteru; Mosden, Aelan; Biolsi, Peter

2017-04-01

Scaling beyond the 7nm technology node demands significant control over the variability down to a few angstroms, in order to achieve reasonable yield. For example, to meet the current scaling targets it is highly desirable to achieve sub 30nm pitch line/space features at back-end of the line (BEOL) or front end of line (FEOL); uniform and precise contact/hole patterning at middle of line (MOL). One of the quintessential requirements for such precise and possibly self-aligned patterning strategies is superior etch selectivity between the target films while other masks/films are exposed. The need to achieve high etch selectivity becomes more evident for unit process development at MOL and BEOL, as a result of low density films choices (compared to FEOL film choices) due to lower temperature budget. Low etch selectivity with conventional plasma and wet chemical etch techniques, causes significant gouging (un-intended etching of etch stop layer, as shown in Fig 1), high line edge roughness (LER)/line width roughness (LWR), non-uniformity, etc. In certain circumstances this may lead to added downstream process stochastics. Furthermore, conventional plasma etches may also have the added disadvantage of plasma VUV damage and corner rounding (Fig. 1). Finally, the above mentioned factors can potentially compromise edge placement error (EPE) and/or yield. Therefore a process flow enabled with extremely high selective etches inherent to film properties and/or etch chemistries is a significant advantage. To improve this etch selectivity for certain etch steps during a process flow, we have to implement alternate highly selective, plasma free techniques in conjunction with conventional plasma etches (Fig 2.). In this article, we will present our plasma free, chemical gas phase etch technique using chemistries that have high selectivity towards a spectrum of films owing to the reaction mechanism ( as shown Fig 1). Gas phase etches also help eliminate plasma damage to the features during the etch process. Herein we will also demonstrate a test case on how a combination or plasma assisted and plasma free etch techniques has the potential to improve process performance of a 193nm immersion based self aligned quandruple patterning (SAQP) for BEOL compliant films (an example shown in Fig 2). In addition, we will also present on the application of gas etches for (1) profile improvement, (2) selective mandrel pull (3) critical dimension trim of mandrels, with an analysis of advantages over conventional techniques in terms of LER and EPE.

Modeling of laser induced air plasma and shock wave dynamics using 2D-hydrodynamic simulations

NASA Astrophysics Data System (ADS)

Paturi, Prem Kiran; S, Sai Shiva; Chelikani, Leela; Ikkurthi, Venkata Ramana; C. D., Sijoy; Chaturvedi, Shashank; Acrhem, University Of Hyderabad Team; Computational Analysis Division, Bhabha Atomic Research Centre, Visakhapatnam Team

2017-06-01

The laser induced air plasma dynamics and the SW evolution modeled using the two dimensional hydrodynamic code by considering two different EOS: ideal gas EOS with charge state effects taken into consideration and Chemical Equilibrium applications (CEA) EOS considering the chemical kinetics of different species will be presented. The inverse bremsstrahlung absorption process due to electron-ion and electron-neutrals is considered for the laser-air interaction process for both the models. The numerical results obtained with the two models were compared with that of the experimental observations over the time scales of 200 - 4000 ns at an input laser intensity of 2.3 ×1010 W/cm2. The comparison shows that the plasma and shock dynamics differ significantly for two EOS considered. With the ideas gas EOS the asymmetric expansion and the subsequent plasma dynamics have been well reproduced as observed in the experiments, whereas with the CEA model these processes were not reproduced due to the laser energy absorption occurring mostly at the focal volume. ACRHEM team thank DRDO, India for funding.

Photocatalytic Anatase TiO2 Thin Films on Polymer Optical Fiber Using Atmospheric-Pressure Plasma.

PubMed

Baba, Kamal; Bulou, Simon; Choquet, Patrick; Boscher, Nicolas D

2017-04-19

Due to the undeniable industrial advantages of low-temperature atmospheric-pressure plasma processes, such as low cost, low temperature, easy implementation, and in-line process capabilities, they have become the most promising next-generation candidate system for replacing thermal chemical vapor deposition or wet chemical processes for the deposition of functional coatings. In the work detailed in this article, photocatalytic anatase TiO 2 thin films were deposited at a low temperature on polymer optical fibers using an atmospheric-pressure plasma process. This method overcomes the challenge of forming crystalline transition metal oxide coatings on polymer substrates by using a dry and up-scalable method. The careful selection of the plasma source and the titanium precursor, i.e., titanium ethoxide with a short alkoxy group, allowed the deposition of well-adherent, dense, and crystalline TiO 2 coatings at low substrate temperature. Raman and XRD investigations showed that the addition of oxygen to the precursor's carrier gas resulted in a further increase of the film's crystallinity. Furthermore, the films deposited in the presence of oxygen exhibited a better photocatalytic activity toward methylene blue degradation assumedly due to their higher amount of photoactive {101} facets.

Comparison of Plasma Polymerization under Collisional and Collision-Less Pressure Regimes.

PubMed

Saboohi, Solmaz; Jasieniak, Marek; Coad, Bryan R; Griesser, Hans J; Short, Robert D; Michelmore, Andrew

2015-12-10

While plasma polymerization is used extensively to fabricate functionalized surfaces, the processes leading to plasma polymer growth are not yet completely understood. Thus, reproducing processes in different reactors has remained problematic, which hinders industrial uptake and research progress. Here we examine the crucial role pressure plays in the physical and chemical processes in the plasma phase, in interactions at surfaces in contact with the plasma phase, and how this affects the chemistry of the resulting plasma polymer films using ethanol as the gas precursor. Visual inspection of the plasma reveals a change from intense homogeneous plasma at low pressure to lower intensity bulk plasma at high pressure, but with increased intensity near the walls of the chamber. It is demonstrated that this occurs at the transition from a collision-less to a collisional plasma sheath, which in turn increases ion and energy flux to surfaces at constant RF power. Surface analysis of the resulting plasma polymer films show that increasing the pressure results in increased incorporation of oxygen and lower cross-linking, parameters which are critical to film performance. These results and insights help to explain the considerable differences in plasma polymer properties observed by different research groups using nominally similar processes.

Plasma assisted surface coating/modification processes - An emerging technology

NASA Technical Reports Server (NTRS)

Spalvins, T.

1987-01-01

A broad understanding of the numerous ion or plasma assisted surface coating/modification processes is sought. An awareness of the principles of these processes is needed before discussing in detail the ion nitriding technology. On the basis of surface modifications arising from ion or plasma energizing and interactions, it can be broadly classified as deposition of distinct overlay coatings (sputtering-dc, radio frequency, magnetron, reactive; ion plating-diode, triode) and surface property modification without forming a discrete coating (ion implantation, ion beam mixing, laser beam irradiation, ion nitriding, ion carburizing, plasma oxidation. These techniques offer a great flexibility and are capable in tailoring desirable chemical and structural surface properties independent of the bulk properties.

Plasma assisted surface coating/modification processes: An emerging technology

NASA Technical Reports Server (NTRS)

Spalvins, T.

1986-01-01

A broad understanding of the numerous ion or plasma assisted surface coating/modification processes is sought. An awareness of the principles of these processes is needed before discussing in detail the ion nitriding technology. On the basis of surface modifications arising from ion or plasma energizing and interactions, it can be broadly classified as deposition of distinct overlay coatings (sputtering-dc, radio frequency, magnetron, reactive; ion plating-diode, triode) and surface property modification without forming a discrete coating (ion implantation, ion beam mixing, laser beam irradiation, ion nitriding, ion carburizing, plasma oxidation). These techniques offer a great flexibility and are capable in tailoring desirable chemical and structural surface properties independent of the bulk properties.

Optical emission diagnostics of plasmas in chemical vapor deposition of single-crystal diamond

DOE PAGES

Hemawan, Kadek W.; Hemley, Russell J.

2015-08-03

Here, a key aspect of single crystal diamond growth via microwave plasma chemical vapor deposition is in-process control of the local plasma-substrate environment, that is, plasma gas phase concentrations of activated species at the plasma boundary layer near the substrate surface. Emission spectra of the plasma relative to the diamond substrate inside the microwave plasma reactor chamber have been analyzed via optical emission spectroscopy. The spectra of radical species such as CH, C 2, and H (Balmer series) important for diamond growth were found to be more depndent on operating pressure than on microwave power. Plasma gas temperatures were calculatedmore » from measurements of the C 2 Swan band (d 3Π → a 3Π transition) system. The plasma gas temperature ranges from 2800 to 3400 K depending on the spatial location of the plasma ball, microwave power and operating pressure. Addition of Ar into CH 4 + H 2 plasma input gas mixture has little influence on the Hα, Hβ, and Hγ intensities and single-crystal diamond growth rates.« less

Advances in induction-heated plasma torch technology

NASA Technical Reports Server (NTRS)

Poole, J. W.; Vogel, C. E.

1972-01-01

Continuing research has resulted in significant advances in induction-heated plasma torch technology which extend and enhance its potential for broad range of uses in chemical processing, materials development and testing, and development of large illumination sources. Summaries of these advances are briefly described.

Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching: effects of SiO2 chamber wall coating

NASA Astrophysics Data System (ADS)

Tinck, S.; Boullart, W.; Bogaerts, A.

2011-08-01

In this paper, simulations are performed to gain a better insight into the properties of a Cl2/Ar plasma, with and without O2, during plasma etching of Si. Both plasma and surface properties are calculated in a self-consistent manner. Special attention is paid to the behavior of etch products coming from the wafer or the walls, and how the chamber walls can affect the plasma and the resulting etch process. Two modeling cases are considered. In the first case, the reactor walls are defined as clean (Al2O3), whereas in the second case a SiO2 coating is introduced on the reactor walls before the etching process, so that oxygen will be sputtered from the walls and introduced into the plasma. For this reason, a detailed reaction set is presented for a Cl2/O2/Ar plasma containing etched species, as well as an extensive reaction set for surface processes, including physical and chemical sputtering, chemical etching and deposition processes. Density and flux profiles of various species are presented for a better understanding of the bulk plasma during the etching process. Detailed information is also given on the composition of the surfaces at various locations of the reactor, on the etch products in the plasma and on the surface loss probabilities of the plasma species at the walls, with different compositions. It is found that in the clean chamber, walls are mostly chlorinated (Al2Cl3), with a thin layer of etch products residing on the wall. In the coated chamber, an oxy-chloride layer is grown on the walls for a few nanometers during the etching process. The Cl atom wall loss probability is found to decrease significantly in the coated chamber, hence increasing the etch rate. SiCl2, SiCl4 and SiCl3 are found to be the main etch products in the plasma, with the fraction of SiCl2 being always slightly higher. The simulation results compare well with experimental data available from the literature.

Non-thermal plasma-induced photocatalytic degradation of 4-chlorophenol in water.

PubMed

Hao, Xiao Long; Zhou, Ming Hua; Lei, Le Cheng

2007-03-22

TiO(2) photocatalyst (P-25) (50mgL(-1)) was tentatively introduced into pulsed high-voltage discharge process for non-thermal plasma-induced photocatalytic degradation of the representative mode organic pollutant parachlorophenol (4-CP), including other compounds phenol and methyl red in water. The experimental results showed that rate constant of 4-CP degradation, energy efficiency for 4-CP removal and TOC removal with TiO(2) were obviously increased. Pulsed high-voltage discharge process with TiO(2) had a promoted effect for the degradation of these pollutants under a broad range of liquid conductivity. Furthermore, the apparent formation rates of chemically active species (e.g., ozone and hydrogen peroxide) were increased, the hydrogen peroxide formation rate from 1.10x10(-6) to 1.50x10(-6)Ms(-1), the ozone formation rate from 1.99x10(-8) to 2.35x10(-8)Ms(-1), respectively. In addition, this process had no influence on the photocatalytic properties of TiO(2). The introduction of TiO(2) photocatalyst into pulsed discharge plasma process in the utilizing of ultraviolet radiation and electric field in pulsed discharge plasma process enhanced the yields of chemically active species, which were available for highly efficient removal and mineralization of organic pollutants.

Membranes produced by plasma enhanced chemical vapor deposition technique for low temperature fuel cell applications

NASA Astrophysics Data System (ADS)

Ennajdaoui, Aboubakr; Roualdes, Stéphanie; Brault, Pascal; Durand, Jean

A plasma polymerization process using a continuous glow discharge has been implemented for preparing proton conducting membranes from trifluoromethane sulfonic acid and styrene. The chemical and physical structure of plasma membranes has been investigated using FTIR and SEM. The films are homogeneous with a good adhesion on commercial gas diffusion layer (E-Tek ®). Their deposition rate can be increased with increasing flow rate and input power. The thermogravimetric analysis under air of plasma polymers has showed a thermal stability up to 140 °C. Compared to the pulsed glow discharge studied in a previous paper, the continuous glow discharge has enabled to enhance the proton conductivity of membranes by a factor 3 (up to 1.7 mS cm -1). Moreover, the low methanol permeability (methanol diffusion coefficient down to 5 × 10 -13 m 2 s -1) of membranes has been confirmed by this study. In an industrial context, a reactor prototype has been developed to manufacture by plasma processes all active layers of fuel cell cores to be integrated in original compact PEMFC or DMFC.

Towards large-scale plasma-assisted synthesis of nanowires

NASA Astrophysics Data System (ADS)

Cvelbar, U.

2011-05-01

Large quantities of nanomaterials, e.g. nanowires (NWs), are needed to overcome the high market price of nanomaterials and make nanotechnology widely available for general public use and applications to numerous devices. Therefore, there is an enormous need for new methods or routes for synthesis of those nanostructures. Here plasma technologies for synthesis of NWs, nanotubes, nanoparticles or other nanostructures might play a key role in the near future. This paper presents a three-dimensional problem of large-scale synthesis connected with the time, quantity and quality of nanostructures. Herein, four different plasma methods for NW synthesis are presented in contrast to other methods, e.g. thermal processes, chemical vapour deposition or wet chemical processes. The pros and cons are discussed in detail for the case of two metal oxides: iron oxide and zinc oxide NWs, which are important for many applications.

A microwave plasma torch and its applications

NASA Astrophysics Data System (ADS)

Uhm, H. S.; Hong, Y. C.; Shin, D. H.

2006-05-01

A portable microwave plasma torch at atmospheric pressure by making use of magnetrons operated at 2.45 GHz and used in a home microwave oven has been developed. This electrodeless torch can be used in various areas including commercial, environmental and military applications. For example, perfluorocompounds (PFCs), which have long lifetimes and serious global warming implications, are widely used during plasma etching and plasma-assisted chamber cleaning processes in chemical vapour deposition systems. The microwave torch effectively eliminates PFCs. Efficient decomposition of toluene gas indicates the effectiveness of volatile organic compound eliminations from industrial emission and the elimination of airborne chemical and biological warfare agents. The microwave torch has been used to synthesize carbon nanotubes in an on-line system, thereby providing the opportunity of mass production of the nanotubes. There are other applications of the microwave plasma torch.

Liquid-Phase Electrical Discharges: Fundamental Mechanisms and Applications

NASA Astrophysics Data System (ADS)

Franclemont, Joshua

The increased demand in alternative energy in recent decades has generated significant interest in cleaner fuel sources including hydrogen and syngas (hydrogen and carbon monoxide). Hydrogen and syngas are both primarily produced through the steam reforming of hydrocarbons, specifically natural gas. Although other processes are known, the cheapest source of these fuels is currently through the heating of natural gas in the presence of steam and a catalyst. However, due to the emissions associated with the steam reforming of natural gas and the lack of low cost, efficient, and reliable onboard hydrogen storage technologies for fuel cell powered vehicles, attention has been focused on plasma-assisted reforming of hydrocarbons. Plasma processes can be implemented onboard and are able to directly reform liquid hydrocarbons and alcohols without external heating or catalysts. In addition to hydrogen and syngas, the plasma-assisted reforming of hydrocarbons and alcohols offers other desirable products such as C2 gases (ethane, ethylene, and acetylene), methanol and ethanol. The primary goal of this study is to investigate the fundamental chemical reactions occurring during plasma-assisted reforming of liquid hydrocarbons and alcohols using streamer-like pulsed electrical discharges. Due to the relatively unexplored field of chemical reactions in liquid plasmas, the focus of this study is on elucidating chemical pathways responsible for the formation of hydrogen, syngas, and other products during the direct reforming of liquid methanol, glycerol, and pentane as model species.

Growth of multiwalled-carbon nanotubes using vertically aligned carbon nanofibers as templates/scaffolds and improved field-emission properties

NASA Astrophysics Data System (ADS)

Cui, H.; Yang, X.; Baylor, L. R.; Lowndes, D. H.

2005-01-01

Multiwalled-carbon nanotubes (MWCNTs) are grown on top of vertically aligned carbon nanofibers (VACNFs) via microwave plasma-enhanced chemical vapor deposition (MPECVD). The VACNFs are first grown in a direct-current plasma-enhanced chemical vapor deposition reactor using nickel catalyst. A layer of carbon-silicon materials is then deposited on the VACNFs and the nickel catalyst particle is broken down into smaller nanoparticles during an intermediate reactive-ion-plasma deposition step. These nickel nanoparticles nucleate and grow MWCNTs in the following MPECVD process. Movable-probe measurements show that the MWCNTs have greatly improved field-emission properties relative to the VACNFs.

Nanocapillary Atmospheric Pressure Plasma Jet: A Tool for Ultrafine Maskless Surface Modification at Atmospheric Pressure.

PubMed

Motrescu, Iuliana; Nagatsu, Masaaki

2016-05-18

With respect to microsized surface functionalization techniques we proposed the use of a maskless, versatile, simple tool, represented by a nano- or microcapillary atmospheric pressure plasma jet for producing microsized controlled etching, chemical vapor deposition, and chemical modification patterns on polymeric surfaces. In this work we show the possibility of size-controlled surface amination, and we discuss it as a function of different processing parameters. Moreover, we prove the successful connection of labeled sugar chains on the functionalized microscale patterns, indicating the possibility to use ultrafine capillary atmospheric pressure plasma jets as versatile tools for biosensing, tissue engineering, and related biomedical applications.

Plasma-enhanced chemical vapor deposition of multiwalled carbon nanofibers.

PubMed

Matthews, Kristopher; Cruden, Brett A; Chen, Bin; Meyyappan, M; Delzeit, Lance

2002-10-01

Plasma-enhanced chemical vapor deposition is used to grow vertically aligned multiwalled carbon nanofibers (MWNFs). The graphite basal planes in these nanofibers are not parallel as in nanotubes; instead they exhibit a small angle resembling a stacked cone arrangement. A parametric study with varying process parameters such as growth temperature, feedstock composition, and substrate power has been conducted, and these parameters are found to influence the growth rate, diameter, and morphology. The well-aligned MWNFs are suitable for fabricating electrode systems in sensor and device development.

Plasma-enhanced chemical vapor deposition of multiwalled carbon nanofibers

NASA Technical Reports Server (NTRS)

Matthews, Kristopher; Cruden, Brett A.; Chen, Bin; Meyyappan, M.; Delzeit, Lance

2002-01-01

Plasma-enhanced chemical vapor deposition is used to grow vertically aligned multiwalled carbon nanofibers (MWNFs). The graphite basal planes in these nanofibers are not parallel as in nanotubes; instead they exhibit a small angle resembling a stacked cone arrangement. A parametric study with varying process parameters such as growth temperature, feedstock composition, and substrate power has been conducted, and these parameters are found to influence the growth rate, diameter, and morphology. The well-aligned MWNFs are suitable for fabricating electrode systems in sensor and device development.

An unstructured shock-fitting solver for hypersonic plasma flows in chemical non-equilibrium

NASA Astrophysics Data System (ADS)

Pepe, R.; Bonfiglioli, A.; D'Angola, A.; Colonna, G.; Paciorri, R.

2015-11-01

A CFD solver, using Residual Distribution Schemes on unstructured grids, has been extended to deal with inviscid chemical non-equilibrium flows. The conservative equations have been coupled with a kinetic model for argon plasma which includes the argon metastable state as independent species, taking into account electron-atom and atom-atom processes. Results in the case of an hypersonic flow around an infinite cylinder, obtained by using both shock-capturing and shock-fitting approaches, show higher accuracy of the shock-fitting approach.

Process for forming exoergic structures with the use of a plasma

DOEpatents

Kelly, Michael D.

1989-02-21

A method of forming exoergic structures, as well as exoergic structures produced by the method, is provided. The method comprises the steps of passing a plasma-forming gas through a plasma spray gun, forming a plasma spray, introducing exoergic material into the plasma spray and directing the plasma spray toward a substrate, and allowing the exoergic material to become molten, without chemically reacting in the plasma spray and to thereafter impinge on the substrate to form a solid mass of exoergic material, the shape of which corresponds to the shape of the substrate.

Graphene nanoribbons: Relevance of etching process

DOE Office of Scientific and Technical Information (OSTI.GOV)

Simonet, P., E-mail: psimonet@phys.ethz.ch; Bischoff, D.; Moser, A.

2015-05-14

Most graphene nanoribbons in the experimental literature are patterned using plasma etching. Various etching processes induce different types of defects and do not necessarily result in the same electronic and structural ribbon properties. This study focuses on two frequently used etching techniques, namely, O{sub 2} plasma ashing and O{sub 2 }+ Ar reactive ion etching (RIE). O{sub 2} plasma ashing represents an alternative to RIE physical etching for sensitive substrates, as it is a more gentle chemical process. We find that plasma ashing creates defective graphene in the exposed trenches, resulting in instabilities in the ribbon transport. These are probably caused bymore » more or larger localized states at the edges of the ashed device compared to the RIE defined device.« less

Global Modeling of Uranium Molecular Species Formation Using Laser-Ablated Plasmas

NASA Astrophysics Data System (ADS)

Curreli, Davide; Finko, Mikhail; Azer, Magdi; Armstrong, Mike; Crowhurst, Jonathan; Radousky, Harry; Rose, Timothy; Stavrou, Elissaios; Weisz, David; Zaug, Joseph

2016-10-01

Uranium is chemically fractionated from other refractory elements in post-detonation nuclear debris but the mechanism is poorly understood. Fractionation alters the chemistry of the nuclear debris so that it no longer reflects the chemistry of the source weapon. The conditions of a condensing fireball can be simulated by a low-temperature plasma formed by vaporizing a uranium sample via laser heating. We have developed a global plasma kinetic model in order to model the chemical evolution of U/UOx species within an ablated plasma plume. The model allows to track the time evolution of the density and energy of an uranium plasma plume moving through an oxygen atmosphere of given fugacity, as well as other relevant quantities such as average electron and gas temperature. Comparison of model predictions with absorption spectroscopy of uranium-ablated plasmas provide preliminary insights on the key chemical species and evolution pathways involved during the fractionation process. This project was sponsored by the DoD, Defense Threat Reduction Agency, Grant HDTRA1-16-1-0020. This work was performed in part under the auspices of the U.S. DoE by Lawrence Livermore National Laboratory under Contract DE-AC52-07NA27344.

Low-temperature ({<=}200 Degree-Sign C) plasma enhanced atomic layer deposition of dense titanium nitride thin films

DOE Office of Scientific and Technical Information (OSTI.GOV)

Samal, Nigamananda; Du Hui; Luberoff, Russell

Titanium nitride (TiN) has been widely used in the semiconductor industry for its diffusion barrier and seed layer properties. However, it has seen limited adoption in other industries in which low temperature (<200 Degree-Sign C) deposition is a requirement. Examples of applications which require low temperature deposition are seed layers for magnetic materials in the data storage (DS) industry and seed and diffusion barrier layers for through-silicon-vias (TSV) in the MEMS industry. This paper describes a low temperature TiN process with appropriate electrical, chemical, and structural properties based on plasma enhanced atomic layer deposition method that is suitable for themore » DS and MEMS industries. It uses tetrakis-(dimethylamino)-titanium as an organometallic precursor and hydrogen (H{sub 2}) as co-reactant. This process was developed in a Veeco NEXUS Trade-Mark-Sign chemical vapor deposition tool. The tool uses a substrate rf-biased configuration with a grounded gas shower head. In this paper, the complimentary and self-limiting character of this process is demonstrated. The effects of key processing parameters including temperature, pulse time, and plasma power are investigated in terms of growth rate, stress, crystal morphology, chemical, electrical, and optical properties. Stoichiometric thin films with growth rates of 0.4-0.5 A/cycle were achieved. Low electrical resistivity (<300 {mu}{Omega} cm), high mass density (>4 g/cm{sup 3}), low stress (<250 MPa), and >85% step coverage for aspect ratio of 10:1 were realized. Wet chemical etch data show robust chemical stability of the film. The properties of the film have been optimized to satisfy industrial viability as a Ruthenium (Ru) preseed liner in potential data storage and TSV applications.« less

Modeling the chemistry of plasma polymerization using mass spectrometry.

PubMed

Ihrig, D F; Stockhaus, J; Scheide, F; Winkelhake, Oliver; Streuber, Oliver

2003-04-01

The goal of the project is a solvent free painting shop. The environmental technologies laboratory is developing processes of plasma etching and polymerization. Polymerized thin films are first-order corrosion protection and primer for painting. Using pure acetylene we get very nice thin films which were not bonded very well. By using air as bulk gas it is possible to polymerize, in an acetylene plasma, well bonded thin films which are stable first-order corrosion protections and good primers. UV/Vis spectroscopy shows nitrogen oxide radicals in the emission spectra of pure nitrogen and air. But nitrogen oxide is fully suppressed in the presence of acetylene. IR spectroscopy shows only C=O, CH(2) and CH(3) groups but no nitrogen species. With the aid of UV/Vis spectra and the chemistry of ozone formation it is possible to define reactive traps and steps, molecule depletion and processes of proton scavenging and proton loss. Using a numerical model it is possible to evaluate these processes and to calculate theoretical mass spectra. Adjustment of theoretical mass spectra to real measurements leads to specific channels of polymerization which are driven by radicals especially the acetyl radical. The estimated theoretical mass spectra show the specific channels of these chemical processes. It is possible to quantify these channels. This quantification represents the mass flow through this chemical system. With respect to these chemical processes it is possible to have an idea of pollutant production processes.

Fluorine compounds for doping conductive oxide thin films

DOEpatents

Gessert, Tim; Li, Xiaonan; Barnes, Teresa M; Torres, Jr., Robert; Wyse, Carrie L

2013-04-23

Methods of forming a conductive fluorine-doped metal oxide layer on a substrate by chemical vapor deposition are described. The methods may include heating the substrate in a processing chamber, and introducing a metal-containing precursor and a fluorine-containing precursor to the processing chamber. The methods may also include adding an oxygen-containing precursor to the processing chamber. The precursors are reacted to deposit the fluorine-doped metal oxide layer on the substrate. Methods may also include forming the conductive fluorine-doped metal oxide layer by plasma-assisted chemical vapor deposition. These methods may include providing the substrate in a processing chamber, and introducing a metal-containing precursor, and a fluorine-containing precursor to the processing chamber. A plasma may be formed that includes species from the metal-containing precursor and the fluorine-containing precursor. The species may react to deposit the fluorine-doped metal oxide layer on the substrate.

Synergistic effect of electrical and chemical factors on endocytosis in micro-discharge plasma gene transfection

NASA Astrophysics Data System (ADS)

Jinno, M.; Ikeda, Y.; Motomura, H.; Isozaki, Y.; Kido, Y.; Satoh, S.

2017-06-01

We have developed a new micro-discharge plasma (MDP)-based gene transfection method, which transfers genes into cells with high efficiency and low cytotoxicity; however, the mechanism underlying the method is still unknown. Studies revealed that the N-acetylcysteine-mediated inhibition of reactive oxygen species (ROS) activity completely abolished gene transfer. In this study, we used laser-produced plasma to demonstrate that gene transfer does not occur in the absence of electrical factors. Our results show that both electrical and chemical factors are necessary for gene transfer inside cells by microplasma irradiation. This indicates that plasma-mediated gene transfection utilizes the synergy between electrical and chemical factors. The electric field threshold required for transfection was approximately 1 kV m-1 in our MDP system. This indicates that MDP irradiation supplies sufficient concentrations of ROS, and the stimulation intensity of the electric field determines the transfection efficiency in our system. Gene transfer by plasma irradiation depends mainly on endocytosis, which accounts for at least 80% of the transfer, and clathrin-mediated endocytosis is a dominant endocytosis. In plasma-mediated gene transfection, alterations in electrical and chemical factors can independently regulate plasmid DNA adhesion and triggering of endocytosis, respectively. This implies that plasma characteristics can be adjusted according to target cell requirements, and the transfection process can be optimized with minimum damage to cells and maximum efficiency. This may explain how MDP simultaneously achieves high transfection efficiency with minimal cell damage.

Modelling of plasma processes in cometary and planetary atmospheres

NASA Astrophysics Data System (ADS)

Campbell, L.; Brunger, M. J.

2013-02-01

Electrons from the Sun, often accelerated by magnetospheric processes, produce low-density plasmas in the upper atmospheres of planets and their satellites. The secondary electrons can produce further ionization, dissociation and excitation, leading to enhancement of chemical reactions and light emission. Similar processes are driven by photoelectrons produced by sunlight in upper atmospheres during daytime. Sunlight and solar electrons drive the same processes in the atmospheres of comets. Thus for both understanding of planetary atmospheres and in predicting emissions for comparison with remote observations it is necessary to simulate the processes that produce upper atmosphere plasmas. In this review, we describe relevant models and their applications and address the importance of electron-impact excitation cross sections, towards gaining a quantitative understanding of the phenomena in question.

Stable aqueous dispersions of functionalized multi-layer graphene by pulsed underwater plasma exfoliation of graphite

NASA Astrophysics Data System (ADS)

Meyer-Plath, Asmus; Beckert, Fabian; Tölle, Folke J.; Sturm, Heinz; Mülhaupt, Rolf

2016-02-01

A process was developed for graphite particle exfoliation in water to stably dispersed multi-layer graphene. It uses electrohydraulic shockwaves and the functionalizing effect of solution plasma discharges in water. The discharges were excited by 100 ns high voltage pulsing of graphite particle chains that bridge an electrode gap. The underwater discharges allow simultaneous exfoliation and chemical functionalization of graphite particles to partially oxidized multi-layer graphene. Exfoliation is caused by shockwaves that result from rapid evaporation of carbon and water to plasma-excited gas species. Depending on discharge energy and locus of ignition, the shockwaves cause stirring, erosion, exfoliation and/or expansion of graphite flakes. The process was optimized to produce long-term stable aqueous dispersions of multi-layer graphene from graphite in a single process step without requiring addition of intercalants, surfactants, binders or special solvents. A setup was developed that allows continuous production of aqueous dispersions of flake size-selected multi-layer graphenes. Due to the well-preserved sp2-carbon structure, thin films made from the dispersed graphene exhibited high electrical conductivity. Underwater plasma discharge processing exhibits high innovation potential for morphological and chemical modifications of carbonaceous materials and surfaces, especially for the generation of stable dispersions of two-dimensional, layered materials.

Patterned growth of carbon nanotubes obtained by high density plasma chemical vapor deposition

NASA Astrophysics Data System (ADS)

Mousinho, A. P.; Mansano, R. D.

2015-03-01

Patterned growth of carbon nanotubes by chemical vapor deposition represents an assembly approach to place and orient nanotubes at a stage as early as when they are synthesized. In this work, the carbon nanotubes were obtained at room temperature by High Density Plasmas Chemical Vapor Deposition (HDPCVD) system. This CVD system uses a new concept of plasma generation, where a planar coil coupled to an RF system for plasma generation was used with an electrostatic shield for plasma densification. In this mode, high density plasmas are obtained. We also report the patterned growth of carbon nanotubes on full 4-in Si wafers, using pure methane plasmas and iron as precursor material (seed). Photolithography processes were used to pattern the regions on the silicon wafers. The carbon nanotubes were characterized by micro-Raman spectroscopy, the spectra showed very single-walled carbon nanotubes axial vibration modes around 1590 cm-1 and radial breathing modes (RBM) around 120-400 cm-1, confirming that high quality of the carbon nanotubes obtained in this work. The carbon nanotubes were analyzed by atomic force microscopy and scanning electron microscopy too. The results showed that is possible obtain high-aligned carbon nanotubes with patterned growth on a silicon wafer with high reproducibility and control.

Cold plasma rapid decontamination of food contact surfaces contaminated with Salmonella biofilms

USDA-ARS?s Scientific Manuscript database

Cross-contamination of fresh produce and other foods from persistent pathogen reservoirs is a known risk factor in processing environments. Industry requires a rapid, waterless, zero-contact, chemical-free method for removing pathogens from food-contact surfaces. Cold plasma was tested for its abili...

Effect of electronegative additives on physical properties and chemical activity of gas discharge plasma

NASA Astrophysics Data System (ADS)

Kuznetsov, D. L.; Filatov, I. E.; Uvarin, V. V.

2018-01-01

Effect of electronegative additives (oxygen O2, sulfur dioxide SO2, carbon disulfide CS2, and carbon tetrachloride CCl4) on physical properties and chemical activity of plasma formed by pulsed corona discharge and by non-self-sustained discharge supported by pulsed electron beam in atmospheric pressure gas mixtures was investigated. It is shown that a decrease in discharge current depends on a sort of the additive and on its concentration. The reason is the difference in rate constants of electron attachment processes for the above molecules. In experiments on volatile organic compounds (VOCs) conversion in air by streamer corona it is obtained that an addition of CCl4 both decreases the discharge current amplitude and increases the VOCs conversion degree. An installation for investigation of electron attachment processes and for study of toxic impurities conversion in plasma formed by non-self-sustained discharge initiated by pulsed nanosecond electron beam is created.

Direct synthesis of graphene on silicon oxide by low temperature plasma enhanced chemical vapor deposition.

PubMed

Muñoz, Roberto; Martínez, Lidia; López-Elvira, Elena; Munuera, Carmen; Huttel, Yves; García-Hernández, Mar

2018-06-27

Direct graphene growth on silicon with a native oxide using plasma enhanced chemical vapour deposition at low temperatures [550 °C-650 °C] is demonstrated for the first time. It is shown that the fine-tuning of a two-step synthesis with gas mixtures C2H2/H2 yields monolayer and few layer graphene films with a controllable domain size from 50 nm to more than 300 nm and the sheet resistance ranging from 8 kΩ sq-1 to less than 1.8 kΩ sq-1. Differences are understood in terms of the interaction of the plasma species - chiefly atomic H - with the deposited graphene and the native oxide layer. The proposed low temperature direct synthesis on an insulating substrate does not require any transfer processes and improves the compatibility with the current industrial processes.

Design and construction of Keda Space Plasma Experiment (KSPEX) for the investigation of the boundary layer processes of ionospheric depletions.

PubMed

Liu, Yu; Zhang, Zhongkai; Lei, Jiuhou; Cao, Jinxiang; Yu, Pengcheng; Zhang, Xiao; Xu, Liang; Zhao, Yaodong

2016-09-01

In this work, the design and construction of the Keda Space Plasma EXperiment (KSPEX), which aims to study the boundary layer processes of ionospheric depletions, are described in detail. The device is composed of three stainless-steel sections: two source chambers at both ends and an experimental chamber in the center. KSPEX is a steady state experimental device, in which hot filament arrays are used to produce plasmas in the two sources. A Macor-mesh design is adopted to adjust the plasma density and potential difference between the two plasmas, which creates a boundary layer with a controllable electron density gradient and inhomogeneous radial electric field. In addition, attachment chemicals can be released into the plasmas through a tailor-made needle valve which leads to the generation of negative ions plasmas. Ionospheric depletions can be modeled and simulated using KSPEX, and many micro-physical processes of the formation and evolution of an ionospheric depletion can be experimentally studied.

Current status and future perspectives of electron interactions with molecules, clusters, surfaces, and interfaces [Workshop on Fundamental challenges in electron-driven chemistry; Workshop on Electron-driven processes: Scientific challenges and technological opportunities

DOE Office of Scientific and Technical Information (OSTI.GOV)

Becker, Kurt H.; McCurdy, C. William; Orlando, Thomas M.

2000-09-01

This report is based largely on presentations and discussions at two workshops and contributions from workshop participants. The workshop on Fundamental Challenges in Electron-Driven Chemistry was held in Berkeley, October 9-10, 1998, and addressed questions regarding theory, computation, and simulation. The workshop on Electron-Driven Processes: Scientific Challenges and Technological Opportunities was held at Stevens Institute of Technology, March 16-17, 2000, and focused largely on experiments. Electron-molecule and electron-atom collisions initiate and drive almost all the relevant chemical processes associated with radiation chemistry, environmental chemistry, stability of waste repositories, plasma-enhanced chemical vapor deposition, plasma processing of materials for microelectronic devices andmore » other applications, and novel light sources for research purposes (e.g. excimer lamps in the extreme ultraviolet) and in everyday lighting applications. The life sciences are a rapidly advancing field where the important role of electron-driven processes is only now beginning to be recognized. Many of the applications of electron-initiated chemical processes require results in the near term. A large-scale, multidisciplinary and collaborative effort should be mounted to solve these problems in a timely way so that their solution will have the needed impact on the urgent questions of understanding the physico-chemical processes initiated and driven by electron interactions.« less

Functionalization of carbon nanotubes by water plasma.

PubMed

Hussain, S; Amade, R; Jover, E; Bertran, E

2012-09-28

Multiwall carbon nanotubes grown by plasma enhanced chemical vapour deposition were functionalized by H(2)O plasma treatment. Through a controlled functionalization process of the carbon nanotubes (CNTs) we were able to modify and tune their chemical reactivity, expanding the range of potential applications in the field of energy and environment. In particular, different oxygen groups were attached to the surfaces of the nanotubes (e.g. carboxyl, hydroxyl and carbonyl), which changed their physicochemical properties. In order to optimize the main operational parameters of the H(2)O plasma treatment, pressure and power, a Box-Wilson experimental design was adopted. Analysis of the morphology, electrochemical properties and functional groups attached to the surfaces of the CNTs allowed us to determine which treatment conditions were suitable for different applications. After water plasma treatment the specific capacitance of the nanotubes increased from 23 up to 68 F g(-1) at a scan rate of 10 mV s(-1).

Influence of grinding on service properties of VT-22 powder applied in additive technologies

NASA Astrophysics Data System (ADS)

Zakharov, M. N.; Rybalko, O. F.; Romanova, O. V.; Gelchinskiy, B. R.; Il'inykh, S. A.; Krashaninin, V. A.

2017-01-01

Powder of titanium alloy (VT-22) produced by plasma-spraying was subjected to grinding to obtain powder with size less 100 microns. These powders were sprayed by plasma unit using two types of gases, namely, air and air with methane (spraying in water and sputtering of coating on steel support). Influence of grinding time on yield of powder of required fraction was studied. Morphology and phase composition of the grinded powder and plasma sprayed one were under investigation. In the result of experiments, it appears that the grinding time genuinely influences the chemical and phase compositions, but there is no effect on physical-processing properties. For powders after plasma spraying some changes of non-metal elements content were detected by chemical analysis. Using gaseous mixture of air and methane in plasma spraying unit leads to formation of a new phase in the powder according X-ray diffraction data.

Method and apparatus for laser/plasma chemical processing of substrates

DOEpatents

Gee, J.M.; Hargis, P.J. Jr.

1984-07-21

A process for the modification of substrate surfaces is described, wherein etching or deposition at a surface occurs only in the presence of both reactive species and a directed beam of coherent light.

Toxicology and occupational hazards of new materials and processes in metal surface treatment, powder metallurgy, technical ceramics, and fiber-reinforced plastics.

PubMed

Midtgård, U; Jelnes, J E

1991-12-01

Many new materials and processes are about to find their way from the research laboratory into industry. The present paper describes some of these processes and provides an overview of possible occupational hazards and a list of chemicals used or produced in the processes. The technological areas that are considered are metal surface treatment (ion implantation, physical and chemical vapor deposition, plasma spraying), powder metallurgy, advanced technical ceramics, and fiber-reinforced plastics.

Stability study: Transparent conducting oxides in chemically reactive plasmas

NASA Astrophysics Data System (ADS)

Manjunatha, Krishna Nama; Paul, Shashi

2017-12-01

Effect of plasma treatment on transparent conductive oxides (TCOs) including indium-doped tin oxide (ITO), fluorine-doped tin oxide (FTO) and aluminium-doped zinc oxide (AZO) are discussed. Stability of electrical and optical properties of TCOs, when exposed to plasma species generated from gases such as hydrogen and silane, are studied extensively. ITO and FTO thin films are unstable and reduce to their counterparts such as Indium and Tin when subjected to plasma. On the other hand, AZO is not only stable but also shows superior electrical and optical properties. The stability of AZO makes it suitable for electronic applications, such as solar cells and transistors that are fabricated under plasma environment. TCOs exposed to plasma with different fabrication parameters are used in the fabrication of silicon nanowire solar cells. The performance of solar cells, which is mired by the plasma, fabricated on ITO and FTO is discussed with respect to plasma exposure parameters while showing the advantages of using chemically stable AZO as an ideal TCO for solar cells. Additionally, in-situ diagnostic tool (optical emission spectroscopy) is used to monitor the deposition process and damage caused to TCOs.

Environmental Benign Process for Production of Molybdenum Metal from Sulphide Based Minerals

NASA Astrophysics Data System (ADS)

Rajput, Priyanka; Janakiram, Vangada; Jayasankar, Kalidoss; Angadi, Shivakumar; Bhoi, Bhagyadhar; Mukherjee, Partha Sarathi

2017-10-01

Molybdenum is a strategic and high temperature refractory metal which is not found in nature in free state, it is predominantly found in earth's crust in the form of MoO3/MoS2. The main disadvantage of the industrial treatment of Mo concentrate is that the process contains many stages and requires very high temperature. Almost in every step many gaseous, liquid, solid chemical substances are formed which require further treatment. To overcome the above drawback, a new alternative one step novel process is developed for the treatment of sulphide and trioxide molybdenum concentrates. This paper presents the results of the investigations on molybdenite dissociation (MoS2) using microwave assisted plasma unit as well as transferred arc thermal plasma torch. It is a single step process for the preparation of pure molybdenum metal from MoS2 by hydrogen reduction in thermal plasma. Process variable such as H2 gas, Ar gas, input current, voltage and time have been examined to prepare molybdenum metal. Molybdenum recovery of the order of 95% was achieved. The XRD results confirm the phases of molybdenum metal and the chemical analysis of the end product indicate the formation of metallic molybdenum (Mo 98%).

Vapor Phase Deposition Using Plasma Spray-PVD™

NASA Astrophysics Data System (ADS)

von Niessen, K.; Gindrat, M.; Refke, A.

2010-01-01

Plasma spray—physical vapor deposition (PS-PVD) is a low pressure plasma spray technology to deposit coatings out of the vapor phase. PS-PVD is a part of the family of new hybrid processes recently developed by Sulzer Metco AG (Switzerland) on the basis of the well-established low pressure plasma spraying (LPPS) technology. Included in this new process family are plasma spray—chemical vapor deposition (PS-CVD) and plasma spray—thin film (PS-TF) processes. In comparison to conventional vacuum plasma spraying and LPPS, these new processes use a high energy plasma gun operated at a work pressure below 2 mbar. This leads to unconventional plasma jet characteristics which can be used to obtain specific and unique coatings. An important new feature of PS-PVD is the possibility to deposit a coating not only by melting the feed stock material which builds up a layer from liquid splats, but also by vaporizing the injected material. Therefore, the PS-PVD process fills the gap between the conventional PVD technologies and standard thermal spray processes. The possibility to vaporize feedstock material and to produce layers out of the vapor phase results in new and unique coating microstructures. The properties of such coatings are superior to those of thermal spray and EB-PVD coatings. This paper reports on the progress made at Sulzer Metco to develop functional coatings build up from vapor phase of oxide ceramics and metals.

Analysis of glow discharges for understanding the process of film formation

NASA Technical Reports Server (NTRS)

Venugopalan, M.; Avni, R.

1984-01-01

The physical and chemical processes which occur during the formation of different types of films in a variety of glow discharge plasmas are discussed. Emphasis is placed on plasma diagnostic experiments using spectroscopic methods, probe analysis, mass spectrometric sampling and magnetic resonance techniques which are well suited to investigate the neutral and ionized gas phase species as well as some aspects of plasma surface interactions. The results on metallic, semi-conducting and insulating films are reviewed in conjunction with proposed models and the problem encountered under film deposition conditions. It is concluded that the understanding of film deposition process requires additional experimental information on plasma surface interactions of free radicals and the synergetic effects where photon, electron and ion bombardment change the reactivity of the incident radical with the surface.

Purification process for vertically aligned carbon nanofibers

NASA Technical Reports Server (NTRS)

Nguyen, Cattien V.; Delziet, Lance; Matthews, Kristopher; Chen, Bin; Meyyappan, M.

2003-01-01

Individual, free-standing, vertically aligned multiwall carbon nanotubes or nanofibers are ideal for sensor and electrode applications. Our plasma-enhanced chemical vapor deposition techniques for producing free-standing and vertically aligned carbon nanofibers use catalyst particles at the tip of the fiber. Here we present a simple purification process for the removal of iron catalyst particles at the tip of vertically aligned carbon nanofibers derived by plasma-enhanced chemical vapor deposition. The first step involves thermal oxidation in air, at temperatures of 200-400 degrees C, resulting in the physical swelling of the iron particles from the formation of iron oxide. Subsequently, the complete removal of the iron oxide particles is achieved with diluted acid (12% HCl). The purification process appears to be very efficient at removing all of the iron catalyst particles. Electron microscopy images and Raman spectroscopy data indicate that the purification process does not damage the graphitic structure of the nanotubes.

Solution plasma applications for the synthesis/modification of inorganic nanostructured materials and the treatment of natural polymers

NASA Astrophysics Data System (ADS)

Watthanaphanit, Anyarat; Saito, Nagahiro

2018-01-01

Reducing the use of toxic chemicals, production steps, and time consumption are important concerns for researchers and process engineers to contribute in the quest for an efficient process in any production. If an equipment setup is simple, the process additionally becomes more profitable. Combination of the mentioned requirements has opened up various applications of the solution plasma process (SPP) — a physical means of generating plasma through an electrical discharge in a liquid medium at atmospheric pressure and room temperature. This review shows the progress of scientific research on the applications of the SPP for the synthesis/modification of inorganic nanostructured materials and the treatment of natural polymers. Development achieved in each application is demonstrated.

Simple realization of efficient barrier performance of a single layer silicon nitride film via plasma chemistry.

PubMed

Lee, Jun Suk; Sahu, Bibhuti Bhusan; Han, Jeon Geon

2016-11-30

Due to the problem of degradation by moisture or oxygen, there is growing interest in efficient gas diffusion barriers for organic optoelectronic devices. Additionally, for the continuous and long-term operation of a device, dedicated flexible thin film encapsulation is required, which is the foremost challenge. Many efforts are being undertaken in the plasma assisted deposition process control for the optimization of film properties. Control of the plasma density along with the energy of the principal plasma species is critical to inducing alteration of the plasma reactivity, chemistry, and film properties. Here, we have used the radio frequency (RF) plasma enhanced chemical vapor deposition (PECVD) technique to deposit amorphous silicon nitride (SiN x ) barrier films onto a plastic substrate at different pressures. A large part of our efforts is devoted to a detailed study of the process parameters controlling the plasma treatment. Numerous plasma diagnostic techniques combined with various characterization tools are purposefully used to characterize and investigate the plasma environment and the associated film properties. This contribution also reports a study of the correlations between the plasma chemistry and the chemical, mechanical, barrier, and optical properties of the deposited films. The data reveal that the film possesses a very low stress for the condition where the net energy imparted on the substrate is at a minimum. Simultaneously, a relatively high ion flux and high energy of the ions impinging on the film growth surfaces are crucial for controlling the film stress and the resulting barrier properties.

Cold plasma rapid decontamination of food contact surfaces contaminated with Salmonella and Escherichia coli 0157:H7

USDA-ARS?s Scientific Manuscript database

Cross-contamination of fresh produce from persistent pathogen reservoirs is a known risk factor in processing environments. Industry requires a waterless, zero-contact, chemical-free method for removing pathogens from food-contact surfaces. Cold plasma was tested for its ability to remove biofilms f...

Rapid separation of bacteria from blood — Chemical aspects

PubMed Central

Alizadeh, Mahsa; Wood, Ryan L.; Buchanan, Clara M.; Bledsoe, Colin G.; Wood, Madison E.; McClellan, Daniel S.; Blanco, Rae; Ravsten, Tanner V.; Husseini, Ghaleb A.; Hickey, Caroline L.; Robison, Richard A.; Pitt, William G.

2017-01-01

To rapidly diagnose infectious organisms causing blood sepsis, bacteria must be rapidly separated from blood, a very difficult process considering that concentrations of bacteria are many orders of magnitude lower than concentrations of blood cells. We have successfully separated bacteria from red and white blood cells using a sedimentation process in which the separation is driven by differences in density and size. Seven mL of whole human blood spiked with bacteria is placed in a 12-cm hollow disk and spun at 3000 rpm for 1 min. The red and white cells sediment more than 30-fold faster than bacteria, leaving much of the bacteria in the plasma. When the disk is slowly decelerated, the plasma flows to a collection site and the red and white cells are trapped in the disk. Analysis of the recovered plasma shows that about 36% of the bacteria is recovered in the plasma. The plasma is not perfectly clear of red blood cells, but about 94% have been removed. This paper describes the effects of various chemical aspects of this process, including the influence of anticoagulant chemistry on the separation efficiency and the use of wetting agents and platelet aggregators that may influence the bacterial recovery. In a clinical scenario, the recovered bacteria can be subsequently analyzed to determine their species and resistance to various antibiotics. PMID:28365426

Numerical studies from quantum to macroscopic scales of carbon nanoparticules in hydrogen plasma

NASA Astrophysics Data System (ADS)

Lombardi, Guillaume; Ngandjong, Alain; Mezei, Zsolt; Mougenot, Jonathan; Michau, Armelle; Hassouni, Khaled; Seydou, Mahamadou; Maurel, François

2016-09-01

Dusty plasmas take part in large scientific domains from Universe Science to nanomaterial synthesis processes. They are often generated by growth from molecular precursor. This growth leads to the formation of larger clusters which induce solid germs nucleation. Particle formed are described by an aerosol dynamic taking into account coagulation, molecular deposition and transport processes. These processes are controlled by the elementary particle. So there is a strong coupling between particle dynamics and plasma discharge equilibrium. This study is focused on the development of a multiscale physic and numeric model of hydrogen plasmas and carbon particles around three essential coupled axes to describe the various physical phenomena: (i) Macro/mesoscopic fluid modeling describing in an auto-coherent way, characteristics of the plasma, molecular clusters and aerosol behavior; (ii) the classic molecular dynamics offering a description to the scale molecular of the chains of chemical reactions and the phenomena of aggregation; (iii) the quantum chemistry to establish the activation barriers of the different processes driving the nanopoarticule formation.

Non-thermal plasma technology for the development of antimicrobial surfaces: a review

NASA Astrophysics Data System (ADS)

Nikiforov, Anton; Deng, Xiaolong; Xiong, Qing; Cvelbar, U.; DeGeyter, N.; Morent, R.; Leys, Christophe

2016-05-01

Antimicrobial coatings are in high demand in many fields including the biomaterials and healthcare sectors. Within recent progress in nanoscience and engineering at the nanoscale, preparation of nanocomposite films containing metal nanoparticles (such as silver nanoparticles, copper nanoparticles, zinc oxide nanoparticles) is becoming an important step in manufacturing biomaterials with high antimicrobial activity. Controlled release of antibiotic agents and eliminating free nanoparticles are of equal importance for engineering antimicrobial nanocomposite materials. Compared to traditional chemical ‘wet’ methods, plasma deposition and plasma polymerization are promising approaches for the fabrication of nanocomposite films with the advantages of gas phase dry processes, effective use of chemicals and applicability to various substrates. In this article, we present a short overview of state-of-the-art engineering of antimicrobial materials based on the use of non-thermal plasmas at low and atmospheric pressure.

Low-temperature preparation of GaN-SiO2 interfaces with low defect density. II. Remote plasma-assisted oxidation of GaN and nitrogen incorporation

NASA Astrophysics Data System (ADS)

Bae, Choelhwyi; Lucovsky, Gerald

2004-11-01

Low-temperature remote plasma-assisted oxidation and nitridation processes for interface formation and passivation have been extended from Si and SiC to GaN. The initial oxidation kinetics and chemical composition of thin interfacial oxide were determined from analysis of on-line Auger electron spectroscopy features associated with Ga, N, and O. The plasma-assisted oxidation process is self-limiting with power-law kinetics similar to those for the plasma-assisted oxidation of Si and SiC. Oxidation using O2/He plasma forms nearly pure GaOx, and oxidation using 1% N2O in N2 forms GaOxNy with small nitrogen content, ~4-7 at. %. The interface and dielectric layer quality was investigated using fabricated GaN metal-oxide-semiconductor capacitors. The lowest density of interface states was achieved with a two-step plasma-assisted oxidation and nitridation process before SiO2 deposition.

Exploring the plasma chemistry in microwave chemical vapor deposition of diamond from C/H/O gas mixtures.

PubMed

Kelly, Mark W; Richley, James C; Western, Colin M; Ashfold, Michael N R; Mankelevich, Yuri A

2012-09-27

Microwave (MW)-activated CH(4)/CO(2)/H(2) gas mixtures operating under conditions relevant to diamond chemical vapor deposition (i.e., X(C/Σ) = X(elem)(C)/(X(elem)(C) + X(elem)(O)) ≈ 0.5, H(2) mole fraction = 0.3, pressure, p = 150 Torr, and input power, P = 1 kW) have been explored in detail by a combination of spatially resolved absorption measurements (of CH, C(2)(a), and OH radicals and H(n = 2) atoms) within the hot plasma region and companion 2-dimensional modeling of the plasma. CO and H(2) are identified as the dominant species in the plasma core. The lower thermal conductivity of such a mixture (cf. the H(2)-rich plasmas used in most diamond chemical vapor deposition) accounts for the finding that CH(4)/CO(2)/H(2) plasmas can yield similar maximal gas temperatures and diamond growth rates at lower input powers than traditional CH(4)/H(2) plasmas. The plasma chemistry and composition is seen to switch upon changing from oxygen-rich (X(C/Σ) < 0.5) to carbon-rich (X(C/Σ) > 0.5) source gas mixtures and, by comparing CH(4)/CO(2)/H(2) (X(C/Σ) = 0.5) and CO/H(2) plasmas, to be sensitive to the choice of source gas (by virtue of the different prevailing gas activation mechanisms), in contrast to C/H process gas mixtures. CH(3) radicals are identified as the most abundant C(1)H(x) [x = 0-3] species near the growing diamond surface within the process window for successful diamond growth (X(C/Σ) ≈ 0.5-0.54) identified by Bachmann et al. (Diamond Relat. Mater.1991, 1, 1). This, and the findings of similar maximal gas temperatures (T(gas) ~2800-3000 K) and H atom mole fractions (X(H)~5-10%) to those found in MW-activated C/H plasmas, points to the prevalence of similar CH(3) radical based diamond growth mechanisms in both C/H and C/H/O plasmas.

Chemical fingerprints of cold physical plasmas - an experimental and computational study using cysteine as tracer compound.

PubMed

Lackmann, J-W; Wende, K; Verlackt, C; Golda, J; Volzke, J; Kogelheide, F; Held, J; Bekeschus, S; Bogaerts, A; Schulz-von der Gathen, V; Stapelmann, K

2018-05-16

Reactive oxygen and nitrogen species released by cold physical plasma are being proposed as effectors in various clinical conditions connected to inflammatory processes. As these plasmas can be tailored in a wide range, models to compare and control their biochemical footprint are desired to infer on the molecular mechanisms underlying the observed effects and to enable the discrimination between different plasma sources. Here, an improved model to trace short-lived reactive species is presented. Using FTIR, high-resolution mass spectrometry, and molecular dynamics computational simulation, covalent modifications of cysteine treated with different plasmas were deciphered and the respective product pattern used to generate a fingerprint of each plasma source. Such, our experimental model allows a fast and reliable grading of the chemical potential of plasmas used for medical purposes. Major reaction products were identified to be cysteine sulfonic acid, cystine, and cysteine fragments. Less-abundant products, such as oxidized cystine derivatives or S-nitrosylated cysteines, were unique to different plasma sources or operating conditions. The data collected point at hydroxyl radicals, atomic O, and singlet oxygen as major contributing species that enable an impact on cellular thiol groups when applying cold plasma in vitro or in vivo.

Rôle de l'hydrogène dans le procédé de purification du silicium par plasma thermique inductif

NASA Astrophysics Data System (ADS)

Erin, J.; Morvan, D.; Amouroux, J.

1993-03-01

The use of the thermal process for purification of silicon led to a material with the chemical purity required for phototovoltaic applications. In this paper, the various properties of ArH2 plasma mixtures are briefly reviewed and the effect of hydrogen percentage in an argon plasma used for melting and purifying silicon is pointed out. Physico-chemical analysis of the purified silicon showed that hydrogen diffused in the material and could passivate crystal defects by formation of stable chemical bonds such as Si-H. La technique de purification du silicium sous plasma thermique permet d'aboutir à un matériau de pureté chimique requise pour l'industrie photovoltaïque. Dans ce travail, nous soulignerons le rôle de l'hydrogène intervenant dans les propriétés du plasma en rappelant les caractéristiques des plasmas Ar-H2 utilisés pour fondre et purifier le silicium. Les caractéristiques physico-chimiques du silicium purifié montrent que l'hydrogène diffuse dans le matériau et est en mesure de cicatriser les défauts cristallins par formation de liaisons chimiques stables de type Si-H.

Plasma for electrification of chemical industry: a case study on CO2 reduction

NASA Astrophysics Data System (ADS)

van Rooij, G. J.; Akse, H. N.; Bongers, W. A.; van de Sanden, M. C. M.

2018-01-01

Significant growth of the share of (intermittent) renewable power in the chemical industry is imperative to meet increasingly stricter limits on CO2 exhaust that are being implemented within Europe. This paper aims to evaluate the potential of a plasma process that converts input CO2 into a pure stream of CO to aid in renewable energy penetration in this sector. A realistic process design is constructed to serve as a basis for an economical analysis. The manufacturing cost price of CO is estimated at 1.2 kUS ton-1 CO. A sensitivity analysis shows that separation is the dominant cost factor, so that improving conversion is currently more effective to lower the price than e.g. energy efficiency.

PREFACE: 26th Symposium on Plasma Science for Materials (SPSM-26)

NASA Astrophysics Data System (ADS)

2014-06-01

26th Symposium on Plasma Science for Materials (SPSM-26) Takayuki Watanabe The 26th Symposium on Plasma Science for Materials (SPSM-26) was held in Fukuoka, Japan on September 23-24, 2013. SPSM has been held annually since 1988 under the sponsorship of The 153rd Committee on Plasma Materials Science, Japan Society for the Promotion of Science (JSPS). This symposium is one of the major activities of the Committee, which is organized by researchers in academia and industry for the purpose of advancing intersectional scientific information exchange and discussion of science and technology of plasma materials processing. Plasma processing have attracted extensive attention due to their unique advantages, and it is expected to be utilized for a number of innovative industrial applications such as synthesis of high-quality and high-performance nanomaterials. The advantages of plasmas including high chemical reactivity in accordance with required chemical reactions are beneficial for innovative processing. In recent years, plasma materials processing with reactive plasmas has been extensively employed in the fields of environmental issues and biotechnology. This conference seeks to bring different scientific communities together to create a forum for discussing the latest developments and issues. The conference provides a platform for the exploration of both fundamental topics and new applications of plasmas by the contacts between science, technology, and industry. The conference was organized in plenary lectures, invited, contributed oral presentations, and poster sessions. At this meeting, we had 142 participants from 10 countries and 104 presentations, including 11 invited presentations. This year, we arranged special topical sessions that cover Plasma Medicine and Biotechnologies, Business and Academia Cooperation, Plasma with Liquids, Plasma Processes for Nanomaterials, together with Basic, Electronics, and Thermal Plasma sessions. This special issue presents 28 papers that are selected via strict peer-review process from full papers submitted for the proceedings of the conference. The topics range from basic physics and chemistry of plasma processing to a broad variety of materials processing and environmental applications. This proceeding offers an overview on the recent advances in thermal and non-equilibrium plasmas as well as the challenges ahead in the field of plasma research and applications among engineers and scientists. It is an honor to present this volume of Journal of Physics: Conference Series and we deeply thank the authors for their enthusiastic and high-grade contribution. The editors hope that this proceeding will be useful and helpful for deepening our understanding of science and technology of plasma materials processing and also for stimulating further development of the plasma technology. Finally, I would like to thank the organizing committee and organizing secretariat of SPSM-26, and the participants of the conference for contribution to a successful and exciting meeting. The conference was chaired by Prof. Masaharu Shiratani, Kyushu University. I would also like to thank the financial support from The 153rd Committee on Plasma Materials Science. Editors of SPMS-26 Prof Takayuki Watanabe, Kyushu University, Japan Prof Makoto Sekine, Nagoya University, Japan Prof Takanori Ichiki, The University of Tokyo, Japan Prof Masaharu Shiratani, Kyushu University, Japan Prof Akimitsu Hatta, Kochi University of Technology, Japan Sponsors and Supporting Organization: The 153rd Committee on Plasma Materials Science, Japan Society for the Promotion of Science

Emerging applications of low temperature gas plasmas in the food industry.

PubMed

Shaw, Alex; Shama, Gilbert; Iza, Felipe

2015-06-16

The global burden of foodborne disease due to the presence of contaminating micro-organisms remains high, despite some notable examples of their successful reduction in some instances. Globally, the number of species of micro-organisms responsible for foodborne diseases has increased over the past decades and as a result of the continued centralization of the food processing industry, outbreaks now have far reaching consequences. Gas plasmas offer a broad range of microbicidal capabilities that could be exploited in the food industry and against which microbial resistance would be unlikely to occur. In addition to reducing the incidence of disease by acting on the micro-organisms responsible for food spoilage, gas plasmas could also play a role in increasing the shelf-life of perishable foods and thereby reduce food wastage with positive financial and environmental implications. Treatment need not be confined to the food itself but could include food processing equipment and also the environment in which commercial food processing occurs. Moreover, gas plasmas could also be used to bring about the degradation of undesirable chemical compounds, such as allergens, toxins, and pesticide residues, often encountered on foods and food-processing equipment. The literature on the application of gas plasmas to food treatment is beginning to reveal an appreciation that attention needs also to be paid to ensuring that the key quality attributes of foods are not significantly impaired as a result of treatment. A greater understanding of both the mechanisms by which micro-organisms and chemical compounds are inactivated, and of the plasma species responsible for this is forming. This is significant, as this knowledge can then be used to design plasma systems with tailored compositions that will achieve maximum efficacy. Better understanding of the underlying interactions will also enable the design and implementation of control strategies capable of minimizing variations in plasma treatment efficacy despite perturbations in environmental and operational conditions.

Numerical simulation of Trichel pulses of negative DC corona discharge based on a plasma chemical model

NASA Astrophysics Data System (ADS)

Chen, Xiaoyue; Lan, Lei; Lu, Hailiang; Wang, Yu; Wen, Xishan; Du, Xinyu; He, Wangling

2017-10-01

A numerical simulation method of negative direct current (DC) corona discharge based on a plasma chemical model is presented, and a coaxial cylindrical gap is adopted. There were 15 particle species and 61 kinds of collision reactions electrons involved, and 22 kinds of reactions between ions are considered in plasma chemical reactions. Based on this method, continuous Trichel pulses are calculated on about a 100 us timescale, and microcosmic physicochemical process of negative DC corona discharge in three different periods is discussed. The obtained results show that the amplitude of Trichel pulses is between 1-2 mA, and that pulse interval is in the order of 10-5 s. The positive ions produced by avalanche ionization enhanced the electric field near the cathode at the beginning of the pulse, then disappeared from the surface of cathode. The electric field decreases and the pulse ceases to develop. The negative ions produced by attachment slowly move away from the cathode, and the electric field increases gradually until the next pulse begins to develop. The positive and negative ions with the highest density during the corona discharge process are O4+ and O3- , respectively.

Fabrication of small complex-shaped optics by plasma chemical vaporization machining with a microelectrode

DOE Office of Scientific and Technical Information (OSTI.GOV)

Takino, Hideo; Shibata, Norio; Itoh, Hiroshi

2006-08-10

We have developed plasma chemical vaporization machining by using a microelectrode for the fabrication of small complex-shaped optical surfaces. In this method, a0.5 mm diameter pipe microelectrode, from which processing gas is drawn in, generates a small localized plasma that is scanned over a work piece under numerical computer control to shape a desired surface. A12 mmx12 mm nonaxisymmetric mirror with a maximum depth of approximately 3 {mu}m was successfully fabricated with a peak-to-valley shape accuracy of 0.04 {mu}m in an area excluding the edges of the mirror. The average surface roughness was 0.58 nm, which is smooth enough formore » optical use.« less

Plasma processes in water under effect of short duration pulse discharges

NASA Astrophysics Data System (ADS)

Gurbanov, Elchin

2013-09-01

It is very important to get a clear water without any impurities and bacteria by methods, that don't change the physical and chemical indicators of water now. In this article the plasma processes during the water treatment by strong electric fields and short duration pulse discharges are considered. The crown discharge around an electrode with a small radius of curvature consists of plasma leader channels with a high conductivity, where the thermo ionization processes and UV-radiation are taken place. Simultaneously the partial discharges around potential electrode lead to formation of atomic oxygen and ozone. The spark discharge arises, when plasma leader channels cross the all interelectrode gap, where the temperature and pressure are strongly grown. As a result the shock waves and dispersing liquid streams in all discharge gap are formed. The plasma channels extend, pressure inside it becomes less than hydrostatic one and the collapse and UV-radiation processes are started. The considered physical processes can be successfully used as a basis for development of pilot-industrial installations for conditioning of drinking water and to disinfecting of sewage.

Incorporation of low energy activated nitrogen onto HOPG surface: Chemical states and thermal stability studies by in-situ XPS and Raman spectroscopy

NASA Astrophysics Data System (ADS)

Chandran, Maneesh; Shasha, Michal; Michaelson, Shaul; Hoffman, Alon

2016-09-01

In this paper we report the chemical states analysis of activated nitrogen incorporated highly oriented pyrolytic graphite (HOPG) surface under well-controlled conditions. Nitrogen incorporation is carried out by two different processes: an indirect RF nitrogen plasma and low energy (1 keV) N2+ implantation. Bonding configuration, concentration and thermal stability of the incorporated nitrogen species by aforesaid processes are systematically compared by in-situ X-ray photoelectron spectroscopy (XPS). Relatively large concentration of nitrogen is incorporated onto RF nitride HOPG surface (16.2 at.%), compared to N2+ implanted HOPG surface (7.7 at.%). The evolution of N 1s components (N1, N2, N3) with annealing temperature is comprehensively discussed, which indicates that the formation and reorganization of local chemical bonding states are determined by the process of nitridation and not by the prior chemical conditioning (i.e., amorphization or hydrogenation) of the HOPG surface. A combined XPS and Raman spectroscopy studies revealed that N2+ implantation process resulted in a high level of defects to the HOPG surface, which cannot be annealed-out by heat treatment up to 1000 °C. On the other hand, the RF nitrogen plasma process did not produce a high level of surface defects, while incorporating nearly the same amount of stable nitrogen species.

Plasma facing materials and components for future fusion devices—development, characterization and performance under fusion specific loading conditions

NASA Astrophysics Data System (ADS)

Linke, J.

2006-04-01

The plasma exposed components in existing and future fusion devices are strongly affected by the plasma material interaction processes. These mechanisms have a strong influence on the plasma performance; in addition they have major impact on the lifetime of the plasma facing armour and the joining interface between the plasma facing material (PFM) and the heat sink. Besides physical and chemical sputtering processes, high heat quasi-stationary fluxes during normal and intense thermal transients are of serious concern for the engineers who develop reliable wall components. In addition, the material and component degradation due to intense fluxes of energetic neutrons is another critical issue in D-T-burning fusion devices which requires extensive R&D. This paper presents an overview on the materials development and joining, the testing of PFMs and components, and the analysis of the neutron irradiation induced degradation.

Engaging high school students as plasma science outreach ambassadors

NASA Astrophysics Data System (ADS)

Wendt, Amy; Boffard, John

2017-10-01

Exposure to plasma science among future scientists and engineers is haphazard. In the U.S., plasma science is rare (or absent) in mainstream high school and introductory college physics curricula. As a result, talented students may be drawn to other careers simply due to a lack of awareness of the stimulating science and wide array of fulfilling career opportunities involving plasmas. In the interest of enabling informed decisions about career options, we have initiated an outreach collaboration with the Madison West High School Rocket Club. Rocket Club members regularly exhibit their activities at public venues, including large-scale expos that draw large audiences of all ages. Building on their historical emphasis on small scale rockets with chemical motors, we worked with the group to add a new feature to their exhibit that highlights plasma-based spacecraft propulsion for interplanetary probes. This new exhibit includes a model satellite with a working (low power) plasma thruster. The participating high school students led the development process, to be described, and enthusiastically learned to articulate concepts related to plasma thruster operation and to compare the relative advantages of chemical vs. plasma/electrical propulsion systems for different scenarios. Supported by NSF Grant PHY-1617602.

Comprehensive process maps for synthesizing high density aluminum oxide-carbon nanotube coatings by plasma spraying for improved mechanical and wear properties

NASA Astrophysics Data System (ADS)

Keshri, Anup Kumar

Plasma sprayed aluminum oxide ceramic coating is widely used due to its outstanding wear, corrosion, and thermal shock resistance. But porosity is the integral feature in the plasma sprayed coating which exponentially degrades its properties. In this study, process maps were developed to obtain Al2O3-CNT composite coatings with the highest density (i.e. lowest porosity) and improved mechanical and wear properties. Process map is defined as a set of relationships that correlates large number of plasma processing parameters to the coating properties. Carbon nanotubes (CNTs) were added as reinforcement to Al2O 3 coating to improve the fracture toughness and wear resistance. Two novel powder processing approaches viz spray drying and chemical vapor growth were adopted to disperse CNTs in Al2O3 powder. The degree of CNT dispersion via chemical vapor deposition (CVD) was superior to spray drying but CVD could not synthesize powder in large amount. Hence optimization of plasma processing parameters and process map development was limited to spray dried Al2O3 powder containing 0, 4 and 8 wt. % CNTs. An empirical model using Pareto diagram was developed to link plasma processing parameters with the porosity of coating. Splat morphology as a function of plasma processing parameter was also studied to understand its effect on mechanical properties. Addition of a mere 1.5 wt. % CNTs via CVD technique showed ˜27% and ˜24% increase in the elastic modulus and fracture toughness respectively. Improved toughness was attributed to combined effect of lower porosity and uniform dispersion of CNTs which promoted the toughening by CNT bridging, crack deflection and strong CNT/Al2O3 interface. Al2O 3-8 wt. % CNT coating synthesized using spray dried powder showed 73% improvement in the fracture toughness when porosity reduced from 4.7% to 3.0%. Wear resistance of all coatings at room and elevated temperatures (573 K, 873 K) showed improvement with CNT addition and decreased porosity. Such behavior was due to improved mechanical properties, protective film formation due to tribochemical reaction, and CNT bridging between the splats. Finally, process maps correlating porosity content, CNT content, mechanical properties, and wear properties were developed.

A new reactive atom plasma technology (RAPT) for precision machining: the etching of ULE optical surfaces

NASA Astrophysics Data System (ADS)

Fanara, Carlo; Shore, Paul; Nicholls, John R.; Lyford, Nicholas; Sommer, Phil; Fiske, Peter

2006-06-01

The next generation of 30-100 metre diameter extremely large telescopes (ELTs) requires large numbers of hexagonal primary mirror segments. As part of the Basic Technology programme run jointly by UCL and Cranfield University, a reactive atomic plasma technology (RAP(tm)) emerged from the US Lawrence Livermore National Laboratory (LLNL), is employed for the finishing of these surfaces. Results are presented on this novel etching technology. The Inductively Coupled Plasma (ICP) operated at atmospheric pressure using argon, activates the chemical species injected through its centre and promotes the fluorine-based chemical reactions at the surface. Process assessment trials on Ultra Low Expansion (ULE(tm)) plates, previously ground at high material removal rates, have been conducted. The quality of the surfaces produced on these samples using the RAP process are discussed. Substantial volumetric material removal rates of up to 0.446(21) mm 3/s at the highest process speed (1,200 mm/min) were found to be possible without pre-heating the substrate. The influences of power transfer, process speed and gas concentration on the removal rates have been determined. The suitability of the RAP process for revealing and removing sub-surface damage induced by high removal rate grinding is discussed. The results on SiC samples are reported elsewhere in this conference.

A model study of the plasma chemistry of stratospheric Blue Jets

NASA Astrophysics Data System (ADS)

Winkler, Holger; Notholt, Justus

2015-04-01

Stratospheric Blue Jets (BJs) are upward propagating discharges in the altitude range 15-40 km above thunderstorms. They appear as conical bodies of blue light originating at the top of thunderclouds and proceed upward with velocities of the order of 100 km/s. Electric discharges in the atmosphere are known to have chemical effects. Of particular interest is the liberation of atomic oxygen and the formation of reactive nitrogen radicals. We have used a numerical plasma chemistry model in order to simulate the chemical processes in stratospheric BJs. It was applied to BJ streamers in the altitude range 18-38 km. The model results show that there is a production of ozone from atomic oxygen liberated at the streamer tips. At the same time, significant amounts of nitric oxide are produced. Compared to earlier plasma chemistry simulations of BJ streamers, the production of NO and O3 is by orders of magnitude larger. Additionally, the chemical processes in the leader part of a BJ have been simulated for the first time. In the leader channel, driven by high-temperature reactions, the concentration of N2O and NO increases by several orders of magnitude, and there is a significant depletion of ozone. The model results might gain importance by the fact that the chemical perturbations in BJs are largest at altitudes of the stratospheric ozone layer.

One-step microwave plasma enhanced chemical vapor deposition (MW-PECVD) for transparent superhydrophobic surface

NASA Astrophysics Data System (ADS)

Thongrom, Sukrit; Tirawanichakul, Yutthana; Munsit, Nantakan; Deangngam, Chalongrat

2018-02-01

We demonstrate a rapid and environmental friendly fabrication technique to produce optically clear superhydrophobic surfaces using poly (dimethylsiloxane) (PDMS) as a sole coating material. The inert PDMS chain is transformed into a 3-D irregular solid network through microwave plasma enhanced chemical vapor deposition (MW-PECVD) process. Thanks to high electron density in the microwave-activated plasma, coating can be done in just a single step with rapid deposition rate, typically much shorter than 10 s. Deposited layers show excellent superhydrophobic properties with water contact angles of ∼170° and roll-off angles as small as ∼3°. The plasma-deposited films can be ultrathin with thicknesses under 400 nm, greatly diminishing the optical loss. Moreover, with appropriate coating conditions, the coating layer can even enhance the transmission over the entire visible spectrum due to a partial anti-reflection effect.

Surface nanostructuring in the carbon–silicon(100) system upon microwave plasma treatment

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yafarov, R. K., E-mail: pirpc@yandex.ru; Shanygin, V. Ya.

2017-04-15

The study is concerned with the physical and chemical processes and the mechanisms of the effect of plasma preparation of a surface on the systematic features of condensation and surface phase transformations during the formation of Si–C mask domains on p-Si(100) crystals by the deposition of submonolayer C coatings in the microwave plasma of low-pressure ethanol vapors. It is shown that, at short durations of the deposition of carbon onto silicon wafers with a natural-oxide coating at a temperature of 100°C, the formation of domains is observed. The lateral dimensions of the domains lie in the range from 10–15 tomore » 200 nm, and the heights of ridges produced by the plasma chemical etching of silicon through the mask domain coatings vary in the range from 40 to 80 nm.« less

Surface analysis of 316 stainless steel treated with cold atmospheric plasma

NASA Astrophysics Data System (ADS)

Williams, David F.; Kellar, Ewen J. C.; Jesson, David A.; Watts, John F.

2017-05-01

The surface of 316 stainless steel has been modified using cold atmospheric plasma (CAP) to increase the surface free energy (by cleaning the and chemically activating the surface)IN preparation for subsequent processes such as painting, coating or adhesive bonding. The analyses carried out, on CAP treated 316 stainless steel surfaces, includes X-ray photoelectron spectroscopy (XPS), imaging XPS (iXPS), and surface free energy (SFE) analysis using contact angle measurements. The CAP treatment is shown to increase the SFE of as-received 316 stainless steel from ∼39 mJ m-1 to >72 mJ m-1 after a short exposure to the plasma torch. This was found to correlate to a reduction in adventitious carbon, as determined by XPS analysis of the surface. The reduction from ∼90 at% to ∼30% and ∼39 at%, after being plasma treated for 5 min and 15 s respectively, shows that the process is relatively quick at changing the surface. It is suggested that the mechanism that causes the increase in surface free energy is chain scission of the hydrocarbon contamination triggered by free electrons in the plasma plume followed by chemical functionalisation of the metal oxide surface and some of the remaining carbon contamination layer.

Pulsed plasma polymerization for controlling shrinkage and surface composition of nanopores

NASA Astrophysics Data System (ADS)

Asghar, Waseem; Ilyas, Azhar; Deshmukh, Rajendra R.; Sumitsawan, Sulak; Timmons, Richard B.; Iqbal, Samir M.

2011-07-01

Solid-state nanopores have emerged as sensors for single molecules and these have been employed to examine the biophysical properties of an increasingly large variety of biomolecules. Herein we describe a novel and facile approach to precisely adjust the pore size, while simultaneously controlling the surface chemical composition of the solid-state nanopores. Specifically, nanopores fabricated using standard ion beam technology are shrunk to the requisite molecular dimensions via the deposition of highly conformal pulsed plasma generated thin polymeric films. The plasma treatment process provides accurate control of the pore size as the conformal film deposition depends linearly on the deposition time. Simultaneously, the pore and channel chemical compositions are controlled by appropriate selection of the gaseous monomer and plasma conditions employed in the deposition of the polymer films. The controlled pore shrinkage is characterized with high resolution AFM, and the film chemistry of the plasma generated polymers is analyzed with FTIR and XPS. The stability and practical utility of this new approach is demonstrated by successful single molecule sensing of double-stranded DNA. The process offers a viable new advance in the fabrication of tailored nanopores, in terms of both the pore size and surface composition, for usage in a wide range of emerging applications.

Optimization and analysis of NF3 in situ chamber cleaning plasmas

NASA Astrophysics Data System (ADS)

Ji, Bing; Yang, James H.; Badowski, Peter R.; Karwacki, Eugene J.

2004-04-01

We report on the optimization and analysis of a dilute NF3 in situ plasma-enhanced chemical vapor deposition chamber cleaning plasma for an Applied Materials P-5000 DxL chamber. Using design of experiments methodology, we identified and optimized operating conditions within the following process space: 10-15 mol % NF3 diluted with helium, 200-400 sccm NF3 flow rate, 2.5-3.5 Torr chamber pressure, and 950 W rf power. Optical emission spectroscopy and Fourier transform infrared spectroscopy were used to endpoint the cleaning processes and to quantify plasma effluent emissions, respectively. The results demonstrate that dilute NF3-based in situ chamber cleaning can be a viable alternative to perfluorocarbon-based in situ cleans with added benefits. The relationship between chamber clean time and fluorine atom density in the plasma is also investigated.

Room temperature deposition of silicon nanodot clusters by plasma-enhanced chemical vapor deposition.

PubMed

Kim, Jae-Kwan; Kim, Jun Young; Yoon, Jae-Sik; Lee, Ji-Myon

2013-10-01

The formation of nanometer-scale (ns)-Si dots and clusters on p-GaN layers has been studied by controlling the early stage of growth during plasma-enhanced chemical vapor deposition (PECVD) at room temperature. We found that ns-Si dots and clusters formed on the p-GaN surface, indicating that growth was the Volmer-Weber mode. The deposition parameters such as radio frequency (RF) power and processing time mainly influenced the size of the ns-Si dots (40 nm-160 nm) and the density of the ns-Si dot clusters.

Effects of Cold Plasma on Food Quality: A Review.

PubMed

Pankaj, Shashi K; Wan, Zifan; Keener, Kevin M

2018-01-01

Cold plasma (CP) technology has proven very effective as an alternative tool for food decontamination and shelf-life extension. The impact of CP on food quality is very crucial for its acceptance as an alternative food processing technology. Due to the non-thermal nature, CP treatments have shown no or minimal impacts on the physical, chemical, nutritional and sensory attributes of various products. This review also discusses the negative impacts and limitations posed by CP technology for food products. The limited studies on interactions of CP species with food components at the molecular level offers future research opportunities. It also highlights the need for optimization studies to mitigate the negative impacts on visual, chemical, nutritional and functional properties of food products. The design versatility, non-thermal, economical and environmentally friendly nature of CP offers unique advantages over traditional processing technologies. However, CP processing is still in its nascent form and needs further research to reach its potential.

Characterization of physical and biochemical changes in plasma treated spinach seed during germination

NASA Astrophysics Data System (ADS)

Hye Ji, Sang; Ki, Se Hoon; Kang, Min Ho; Choi, Jin Sung; Park, Yeunsoo; Oh, Jaesung; Kim, Seong Bong; Yoo, Suk Jae; Choi, Eun Ha; Park, Gyungsoon

2018-04-01

Despite the accumulating data on the effect of plasma on seed germination, mechanisms of plasma action need more extensive research. In a previous study, we observed that high voltage nanosecond pulsed plasma enhanced the germination of spinach seeds and subsequent seedling growth. As a follow-up study, we investigated the physico-chemical, biochemical, and molecular changes in seed after plasma treatment, focusing on the early germination stage, to elucidate mechanism(s) for the stimulating effects of plasma on seed germination. The primary radicle protruded from seeds exposed to high voltage nanosecond pulsed plasma (one shot) slightly faster than the control seeds. The hydrophilicity of the seed surface significantly increased after treatment with high voltage nanosecond pulsed plasma (one shot). However, a very subtle increase in water uptake by plasma treated seeds was observed. Raman and FTIR spectroscopy analyses on chloroform extract of seed coats demonstrated no significant chemical etching on the surface of plasma treated seeds. This may be related to no dramatic increase in water absorption by seeds. The level of GA hormone and starch hydrolysis inside the plasma treated seeds was significantly elevated within 24 h. Taken together, our results suggest that high voltage nanosecond pulsed plasma may not only enhance hydrophilicity of the seed surface but also stimulate biochemical and molecular processes inside seed, leading to enhanced embryonic development.

Plasmas for environmental issues: from hydrogen production to 2D materials assembly

NASA Astrophysics Data System (ADS)

Tatarova, E.; Bundaleska, N.; Sarrette, J. Ph; Ferreira, C. M.

2014-12-01

It is well recognized at present that the unique, high energy density plasma environment provides suitable conditions to dissociate/atomize molecules in remediation systems, to convert waste and biomass into sustainable energy sources, to purify water, to assemble nanostructures, etc. The remarkable plasma potential is based on its ability to supply simultaneously high fluxes of charged particles, chemically active molecules, radicals (e.g. O, H, OH), heat, highly energetic photons (UV and extreme UV radiation), and strong electric fields in intrinsic sheath domains. Due to this complexity, low-temperature plasma science and engineering is a huge, highly interdisciplinary field that spans many research disciplines and applications across many areas of our daily life and industrial activities. For this reason, this review deals only with some selected aspects of low-temperature plasma applications for a clean and sustainable environment. It is not intended to be a comprehensive survey, but just to highlight some important works and achievements in specific areas. The selected issues demonstrate the diversity of plasma-based applications associated with clean and sustainable ambiance and also show the unity of the underlying science. Fundamental plasma phenomena/processes/features are the common fibers that pass across all these areas and unify all these applications. Browsing through different topics, we try to emphasize these phenomena/processes/features and their uniqueness in an attempt to build a general overview. The presented survey of recently published works demonstrates that plasma processes show a significant potential as a solution for waste/biomass-to-energy recovery problems. The reforming technologies based on non-thermal plasma treatment of hydrocarbons show promising prospects for the production of hydrogen as a future clean energy carrier. It is also shown that plasmas can provide numerous agents that influence biological activity. The simultaneous generation in water discharges of intense UV radiation, shock waves and active radicals (OH, O, H2O2, etc), which are all effective agents against many biological pathogens and harmful chemicals, make these discharges suitable for decontamination, sterilization and purification processes. Moreover, plasmas appear as invaluable tools for the synthesis and engineering of new nanomaterials and in particular 2D materials. A brief overview on plasma-synthesized carbon nanostructures shows the high potential of such materials for energy conversion and storage applications.

Plasma-activation of tap water using DBD for agronomy applications: Identification and quantification of long lifetime chemical species and production/consumption mechanisms.

PubMed

Judée, F; Simon, S; Bailly, C; Dufour, T

2018-04-15

Cold atmospheric plasmas are weakly ionized gases that can be generated in ambient air. They produce energetic species (e.g. electrons, metastables) as well as reactive oxygen species, reactive nitrogen species, UV radiations and local electric field. Their interaction with a liquid such as tap water can hence change its chemical composition. The resulting "plasma-activated liquid" can meet many applications, including medicine and agriculture. Consequently, a complete experimental set of analytical techniques dedicated to the characterization of long lifetime chemical species has been implemented to characterize tap water treated using cold atmospheric plasma process and intended to agronomy applications. For that purpose, colorimetry and acid titrations are performed, considering acid-base equilibria, pH and temperature variations induced during plasma activation. 16 species are quantified and monitored: hydroxide and hydronium ions, ammonia and ammonium ions, orthophosphates, carbonate ions, nitrite and nitrate ions and hydrogen peroxide. The related consumption/production mechanisms are discussed. In parallel, a chemical model of electrical conductivity based on Kohlrausch's law has been developed to simulate the electrical conductivity of the plasma-activated tap water (PATW). Comparing its predictions with experimental measurements leads to a narrow fitting, hence supporting the self-sufficiency of the experimental set, I.e. the fact that all long lifetime radicals of interest present in PATW are characterized. Finally, to evaluate the potential of cold atmospheric plasmas for agriculture applications, tap water has been daily plasma-treated to irrigate lentils seeds. Then, seedlings lengths have been measured and compared with untreated tap water, showing an increase as high as 34.0% and 128.4% after 3 days and 6 days of activation respectively. The interaction mechanisms between plasma and tap water are discussed as well as their positive synergy on agronomic results. Copyright © 2017 Elsevier Ltd. All rights reserved.

Lift-off process with bi-layer photoresist patterns for conformal-coated superhydrophilic pulsed plasma chemical vapor deposition-SiOx on SiCx for lab-on-a-chip applications

NASA Astrophysics Data System (ADS)

Konishi, Satoshi; Nakagami, Chise; Kobayashi, Taizo; Tonomura, Wataru; Kaizuma, Yoshihiro

2015-04-01

In this work, a lift-off process with bi-layer photoresist patterns was applied to the formation of hydrophobic/hydrophilic micropatterns on practical polymer substrates used in healthcare diagnostic commercial products. The bi-layer photoresist patterns with undercut structures made it possible to peel the conformal-coated silicon oxide (SiOx) films from substrates. SiOx and silicon carbide (SiCx) layers were deposited by pulsed plasma chemical vapor deposition (PPCVD) method which can form roughened surfaces to enhance hydrophilicity of SiOx and hydrophobicity of SiCx. Microfluidic applications using hydrophobic/hydrophilic patterns were also demonstrated on low-cost substrates such as poly(ethylene terephthalate) (PET) and paper films.

Modeling of plasma chemical processes in the artificial ionized layer in the upper atmosphere by the nanosecond corona discharge

NASA Astrophysics Data System (ADS)

Vikharev, A. L.; Gorbachev, A. M.; Ivanov, O. A.; Kolisko, A. L.; Litvak, A. G.

1993-08-01

The plasma chemical processes in the corona discharge formed in air by a series of high voltage pulses of nanosecond duration are investigated experimentally. The experimental conditions (reduced electric field, duration and repetition frequency of the pulses, gas pressure in the chamber) modeled the regime of creation of the artificial ionized layer (AIL) in the upper atmosphere by a nanosecond microwave discharge. It was found that in a nanosecond microwave discharge predominantly generation of ozone occurs, and that the production of nitrogen dioxide is not large. The energy expenditures for the generation of one O 3 molecule were about 15 eV. On the basis of the experimental results the prognosis of the efficiency of ozone generation in AIL was made.

Environmentally benign semiconductor processing for dielectric etch

NASA Astrophysics Data System (ADS)

Liao, Marci Yi-Ting

Semiconductor processing requires intensive usage of chemicals, electricity, and water. Such intensive resource usage leaves a large impact on the environment. For instance, in Silicon Valley, the semiconductor industry is responsible for 80% of the hazardous waste sites contaminated enough to require government assistance. Research on environmentally benign semiconductor processing is needed to reduce the environmental impact of the semiconductor industry. The focus of this dissertation is on the environmental impact of one aspect of semiconductor processing: patterning of dielectric materials. Plasma etching of silicon dioxide emits perfluorocarbons (PFCs) gases, like C2F6 and CF4, into the atmosphere. These gases are super global warming/greenhouse gases because of their extremely long atmospheric lifetimes and excellent infrared absorption properties. We developed the first inductively coupled plasma (ICP) abatement device for destroying PFCs downstream of a plasma etcher. Destruction efficiencies of 99% and 94% can be obtained for the above mentioned PFCs, by using O 2 as an additive gas. Our results have lead to extensive modeling in academia as well as commercialization of the ICP abatement system. Dielectric patterning of hi-k materials for future device technology brings different environment challenges. The uncertainty of the hi-k material selection and the patterning method need to be addressed. We have evaluated the environmental impact of three different dielectric patterning methods (plasma etch, wet etch and chemical-mechanical polishing), as well as, the transistor device performances associated with the patterning methods. Plasma etching was found to be the most environmentally benign patterning method, which also gives the best device performance. However, the environmental concern for plasma etching is the possibility of cross-contamination from low volatility etch by-products. Therefore, mass transfer in a plasma etcher for a promising hi-k dielectric material, ZrO2, was studied. A novel cross-contamination sampling technique was developed, along with a mass transfer model.

High Throughput Plasma Water Treatment

NASA Astrophysics Data System (ADS)

Mujovic, Selman; Foster, John

2016-10-01

The troublesome emergence of new classes of micro-pollutants, such as pharmaceuticals and endocrine disruptors, poses challenges for conventional water treatment systems. In an effort to address these contaminants and to support water reuse in drought stricken regions, new technologies must be introduced. The interaction of water with plasma rapidly mineralizes organics by inducing advanced oxidation in addition to other chemical, physical and radiative processes. The primary barrier to the implementation of plasma-based water treatment is process volume scale up. In this work, we investigate a potentially scalable, high throughput plasma water reactor that utilizes a packed bed dielectric barrier-like geometry to maximize the plasma-water interface. Here, the water serves as the dielectric medium. High-speed imaging and emission spectroscopy are used to characterize the reactor discharges. Changes in methylene blue concentration and basic water parameters are mapped as a function of plasma treatment time. Experimental results are compared to electrostatic and plasma chemistry computations, which will provide insight into the reactor's operation so that efficiency can be assessed. Supported by NSF (CBET 1336375).

Chemical and Mechanical Characterization of Diamond-Like Carbon Hard Coatings

DOE Office of Scientific and Technical Information (OSTI.GOV)

Poker, D B; Doughty, C

1999-12-28

This CRADA was intended to investigate and optimize the process used by ASTEX-PlasmaQuest for deposition of diamond-like carbon films. Approval for funding was delayed, and an unexpected move of the PlasmaQuest headquarters and research facilities prevented appropriate samples from being prepared before the end of the CRADA. Therefore, No effort was expended under this program.

Analysis of ECs and related compounds in plasma: artifactual isomerization and ex vivo enzymatic generation of 2-MGs.

PubMed

Pastor, Antoni; Farré, Magí; Fitó, Montserrat; Fernandez-Aranda, Fernando; de la Torre, Rafael

2014-05-01

The analysis of peripheral endocannabinoids (ECs) is a good biomarker of the EC system. Their concentrations, from clinical studies, strongly depend on sample collection and time processing conditions taking place in clinical and laboratory settings. The analysis of 2-monoacylglycerols (MGs) (i.e., 2-arachidonoylglycerol or 2-oleoylglycerol) is a particularly challenging issue because of their ex vivo formation and chemical isomerization that occur after blood sample collection. We provide evidence that their ex vivo formation can be minimized by adding Orlistat, an enzymatic lipase inhibitor, to plasma. Taking into consideration the low cost of Orlistat, we recommend its addition to plasma collecting tubes while maintaining sample cold chain until storage. We have validated a method for the determination of the EC profile of a range of MGs and N-acylethanolamides in plasma that preserves the original isomer ratio of MGs. Nevertheless, the chemical isomerization of 2-MGs can only be avoided by an immediate processing and analysis of samples due to their instability during conservation. We believe that this new methodology can aid in the harmonization of the measurement of ECs and related compounds in clinical samples.

Structural and optical properties of arsenic sulfide films synthesized by a novel PECVD-based approach

NASA Astrophysics Data System (ADS)

Mochalov, Leonid; Kudryashov, Mikhail; Logunov, Aleksandr; Zelentsov, Sergey; Nezhdanov, Aleksey; Mashin, Alexandr; Gogova, Daniela; Chidichimo, Giuseppe; De Filpo, Giovanni

2017-11-01

A new plasma-enhanced chemical vapor deposition-based (PECVD) approach for synthesizing of As-S films, with As content in the range 60-40 at.%, is demonstrated. The process has been carried out in a low-temperature Ar-plasma, employing for the first time volatile As and S as precursors. Utilization of inorganic elemental precursors, in contrast to the typically used in CVD metal-organic compounds or volatile hydrides/halides of Va- and VIa-group-elements, gives the possibility to reach the highest quality and purity of the As-S ≿halcogenide films. Quantum-chemical calculations have been performed to gain insight into the PECVD As-S chalcogenide films structure and the mechanism of its formation in the plasma discharge. An additional vibrational band near 650 cm-1 corresponding to cycled 2-dimensional units is observed by Raman spectroscopy. The process developed is cost-efficient one due to the very precise control and the long-term stability of the plasma parameters and it possesses a high potential for large-area applications such as fabrication of miniature integrated optical elements and 2D/3D printing of optical devices.

High Throughput Determination of Critical Human Dosing ...

EPA Pesticide Factsheets

High throughput toxicokinetics (HTTK) is a rapid approach that uses in vitro data to estimate TK for hundreds of environmental chemicals. Reverse dosimetry (i.e., reverse toxicokinetics or RTK) based on HTTK data converts high throughput in vitro toxicity screening (HTS) data into predicted human equivalent doses that can be linked with biologically relevant exposure scenarios. Thus, HTTK provides essential data for risk prioritization for thousands of chemicals that lack TK data. One critical HTTK parameter that can be measured in vitro is the unbound fraction of a chemical in plasma (Fub). However, for chemicals that bind strongly to plasma, Fub is below the limits of detection (LOD) for high throughput analytical chemistry, and therefore cannot be quantified. A novel method for quantifying Fub was implemented for 85 strategically selected chemicals: measurement of Fub was attempted at 10%, 30%, and 100% of physiological plasma concentrations using rapid equilibrium dialysis assays. Varying plasma concentrations instead of chemical concentrations makes high throughput analytical methodology more likely to be successful. Assays at 100% plasma concentration were unsuccessful for 34 chemicals. For 12 of these 34 chemicals, Fub could be quantified at 10% and/or 30% plasma concentrations; these results imply that the assay failure at 100% plasma concentration was caused by plasma protein binding for these chemicals. Assay failure for the remaining 22 chemicals may

Improving anti-felting characteristics of Merino wool fiber by 2.5 MHz atmosphere pressure air plasma

NASA Astrophysics Data System (ADS)

Chandwani, Nisha; Dave, Purvi; Jain, Vishal; Nema, Sudhir; Mukherjee, Subroto

2017-04-01

The present work investigates the effect of high frequency (2.5 MHz) Dielectric Barrier Discharge (DBD) in air on surface characteristics of Merino wool as a function of plasma exposure time (5s to 15s). The FE-SEM (Field Emission Scanning Electron Microscopy), EDS (Energy Dispersive X-ray spectrum) and Derivative ATR-FTIR (Attenuated Total Reflection- Fourier Transform Infrared) Spectroscopy are used to study physio-chemical changes induced by plasma. These physio-chemical properties of fibers can be co-related with the felting behaviour of the wool fiber, which leads to shrinkage and pilling of garments while laundering. Felting occurs mainly because of presence of outermost hydrophobic cuticle layer having sharp scales. The FE-SEM analysis of wool fiber surface reveals that cuticle scales on wool fiber become blunt after plasma processing. The ATR-FTIR analysis along with second order derivative spectroscopy demonstrates the cleavage of di-sulphide bonds of cuticle and formation of sulphur-oxygen groups such as Cystine Sulphonate (-S-SO3-), cysteic acid (-SO3-), cystine monoxide(-SO-S-), cysteine di-oxide (-SO2-S-). A possible explanation about how the combined effect of morphological and chemical changes induced by plasma results in minimizing the felting of wool fibers is discussed.

Monoclonal antibodies specific to heat-treated porcine blood.

PubMed

Raja Nhari, Raja Mohd Hafidz; Hamid, Muhajir; Rasli, Nurmunirah Mohamad; Omar, Abdul Rahman; El Sheikha, Aly Farag; Mustafa, Shuhaimi

2016-05-01

Porcine blood is potentially being utilized in food as a binder, gelling agent, emulsifier or colorant. However, for certain communities, the usage of animal blood in food is strictly prohibited owing to religious concerns and health reasons. This study reports the development of monoclonal antibodies (MAbs) against heat-treated soluble proteins (HSPs) of autoclaved porcine blood; characterization of MAbs against blood, non-blood and plasma from different animal species using qualitative indirect non-competitive enzyme-linked immunosorbent assay (ELISA); and immunoblotting of antigenic components in HSPs of porcine blood. Fifteen MAbs are specific to heat-treated and raw porcine blood and not cross-reacted with other animal blood and non-blood proteins (meat and non-meat). Twelve MAbs are specific to porcine plasma, while three MAbs specific to porcine plasma are cross-reacted with chicken plasma. Immunoblotting revealed antigenic protein bands (∼60, ∼85-100 and ∼250 kDa) in porcine blood and plasma recognized by the MAbs. Selection of MAbs that recognized 60 kDa HSPs of porcine blood and plasma as novel monoclonal antibodies would be useful for detection of porcine plasma in processed food using the immunoassay method. © 2015 Society of Chemical Industry. © 2015 Society of Chemical Industry.

CO2 Dissociation by Low Current Gliding Discharge in the Reverse Vortex Flow

NASA Astrophysics Data System (ADS)

Gutsol, Alexander

2012-10-01

If performed with high energy efficiency, plasma-chemical dissociation of carbon dioxide can be a way of converting and storing energy when there is an excess of electric energy, for example generated by solar elements of wind turbines. CO2 dissociation with efficiency of up to 90% was reported earlier for low pressure microwave discharge in supersonic flow. A new plasma-chemical system uses a low current gliding discharge in the reverse vortex flow of plasma gas. The system is a development of the Gliding Arc in Tornado reactor. The system was used to study dissociation of CO2 in wide ranges of the following experimental parameters: reactor pressure (15-150 kPa), discharge current (50-500 mA), gas flow rate (3-30 liters per minute), and electrode gap length (1-10 cm). Additionally, the effect of thermal energy recuperation on CO2 dissociation efficiency was tested. Plasma chemical efficiency of CO2 dissociation is very low (about 3%) in a short discharge at low pressures (about 15 kPa) when it is defined by electronic excitation. The highest efficiency (above 40%) was reached at pressures 50-70 kPa in a long discharge with thermal energy recuperation. It means that the process is controlled by thermal dissociation with subsequent effective quenching. Plasma chemical efficiency was determined from the data of chromatographic analysis and oscilloscope electric power integration, and also was checked calorimetrically by the thermal balance of the system.

Electrodeposition of thin yttria-stabilized zirconia layers using glow-discharge plasma

NASA Astrophysics Data System (ADS)

Ogumi, Zempachi; Uchimoto, Yoshiharu; Tsuji, Yoichiro; Takehara, Zen-ichiro

1992-08-01

A novel process for preparation of thin yttria-stabilized zirconia (YSZ) layers was developed. This process differs from other vapor-phase deposition methods in that a dc bias circuit, separate from the plasma-generation circuit, is used for the electrodeposition process. The YSZ layer was electrodeposited from ZrCl4 and YCl3 on a nonporous calcia-stabilized zirconia substrate. Scanning electron microscopy, electron probe microanalysis, electron spectroscopy for chemical analysis, and x-ray-diffraction measurements confirmed the electrodeposition of a smooth, pinhole-free yttria-stabilized zirconia film of about 3 μm thickness.

Methodology and Results of Mathematical Modelling of Complex Technological Processes

NASA Astrophysics Data System (ADS)

Mokrova, Nataliya V.

2018-03-01

The methodology of system analysis allows us to draw a mathematical model of the complex technological process. The mathematical description of the plasma-chemical process was proposed. The importance the quenching rate and initial temperature decrease time was confirmed for producing the maximum amount of the target product. The results of numerical integration of the system of differential equations can be used to describe reagent concentrations, plasma jet rate and temperature in order to achieve optimal mode of hardening. Such models are applicable both for solving control problems and predicting future states of sophisticated technological systems.

Optoelectronic properties of Black-Silicon generated through inductively coupled plasma (ICP) processing for crystalline silicon solar cells

NASA Astrophysics Data System (ADS)

Hirsch, Jens; Gaudig, Maria; Bernhard, Norbert; Lausch, Dominik

2016-06-01

The optoelectronic properties of maskless inductively coupled plasma (ICP) generated black silicon through SF6 and O2 are analyzed by using reflection measurements, scanning electron microscopy (SEM) and quasi steady state photoconductivity (QSSPC). The results are discussed and compared to capacitively coupled plasma (CCP) and industrial standard wet chemical textures. The ICP process forms parabolic like surface structures in a scale of 500 nm. This surface structure reduces the average hemispherical reflection between 300 and 1120 nm up to 8%. Additionally, the ICP texture shows a weak increase of the hemispherical reflection under tilted angles of incidence up to 60°. Furthermore, we report that the ICP process is independent of the crystal orientation and the surface roughness. This allows the texturing of monocrystalline, multicrystalline and kerf-less wafers using the same parameter set. The ICP generation of black silicon does not apply a self-bias on the silicon sample. Therefore, the silicon sample is exposed to a reduced ion bombardment, which reduces the plasma induced surface damage. This leads to an enhancement of the effective charge carrier lifetime up to 2.5 ms at 1015 cm-3 minority carrier density (MCD) after an atomic layer deposition (ALD) with Al2O3. Since excellent etch results were obtained already after 4 min process time, we conclude that the ICP generation of black silicon is a promising technique to substitute the industrial state of the art wet chemical textures in the solar cell mass production.

Development of CVD Diamond for Industrial Applications Final Report CRADA No. TC-2047-02

DOE Office of Scientific and Technical Information (OSTI.GOV)

Caplan, M.; Olstad, R.; Jory, H.

2017-09-08

This project was a collaborative effort to develop and demonstrate a new millimeter microwave assisted chemical vapor deposition(CVD) process for manufacturing large diamond disks with greatly reduced processing times and costs from those now available. In the CVD process, carbon based gases (methane) and hydrogen are dissociated into plasma using microwave discharge and then deposited layer by layer as polycrystalline diamond onto a substrate. The available low frequency (2.45GHz) microwave sources used elsewhere (De Beers) result in low density plasmas and low deposition rates: 4 inch diamond disks take 6-8 weeks to process. The new system developed in this projectmore » uses a high frequency 30GHz Gyrotron as the microwave source and a quasi-optical CVD chamber resulting in a much higher density plasma which greatly reduced the diamond processing times (1-2 weeks)« less

Influence of dielectric barrier discharge treatment on mechanical and dyeing properties of wool

NASA Astrophysics Data System (ADS)

Rahul, NAVIK; Sameera, SHAFI; Md Miskatul, ALAM; Md Amjad, FAROOQ; Lina, LIN; Yingjie, CAI

2018-06-01

Physical and chemical properties of wool surface significantly affect the absorbency, rate of dye bath exhaustion and fixation of the industrial dyes. Hence, surface modification is a necessary operation prior to coloration process in wool wet processing industries. Plasma treatment is an effective alternative for physiochemical modification of wool surface. However, optimum processing parameters to get the expected modification are still under investigation, hence this technology is still under development in the wool wet processing industries. Therefore, in this paper, treatment parameters with the help of simple dielectric barrier discharge plasma reactor and air as a plasma gas, which could be a promising combination for treatment of wool substrate at industrial scale were schematically studied, and their influence on the water absorbency, mechanical, and dyeing properties of twill woven wool fabric samples are reported. It is expected that the results will assist to the wool coloration industries to improve the dyeing processes.

Atmospheric Pressure Plasma-Electrospin Hybrid Process for Protective Applications

NASA Astrophysics Data System (ADS)

Vitchuli Gangadharan, Narendiran

2011-12-01

Chemical and biological (C-B) warfare agents like sarin, sulfur mustard, anthrax are usually dispersed into atmosphere in the form of micro aerosols. They are considered to be dangerous weapon of mass destruction next to nuclear weapons. The airtight protective clothing materials currently available are able to stop the diffusion of threat agents but not good enough to detoxify them, which endangers the wearers. Extensive research efforts are being made to prepare advanced protective clothing materials that not only prevent the diffusion of C-B agents, but also detoxify them into harmless products thus ensuring the safety and comfort of the wearer. Electrospun nanofiber mats are considered to have effective filtration characteristics to stop the diffusion of submicron level particulates without sacrificing air permeability characteristics and could be used in protective application as barrier material. In addition, functional nanofibers could be potentially developed to detoxify the C-B warfare threats into harmless products. In this research, electrospun nanofibers were deposited on fabric surface to improve barrier efficiency without sacrificing comfort-related properties of the fabrics. Multi-functional nanofibers were fabricated through an electrospinning-electrospraying hybrid process and their ability to detoxify simulants of C-B agents was evaluated. Nanofibers were also deposited onto plasma-pretreated woven fabric substrate through a newly developed plasma-electrospinning hybrid process, to improve the adhesive properties of nanofibers on the fabric surface. The nanofiber adhesion and durability properties were evaluated by peel test, flex and abrasion resistance tests. In this research work, following tasks have been carried out: i) Controlled deposition of nanofiber mat onto woven fabric substrate Electrospun Nylon 6 fiber mats were deposited onto woven 50/50 Nylon/Cotton fabric with the motive of making them into protective material against submicron-level aerosol chemical and biological threats. Polymer solution concentration, electrospinning voltage, and deposition areal density were varied to establish the relationship of processing-structure-filtration efficiency for electrospun fiber mats. A high barrier efficiency of greater than 99.5% was achieved on electrospun fiber mats without sacrificing air permeability and pressure drop. ii) Fabrication and Characterization of Multifunctional ZnO/Nylon 6 nanofibers ZnO/Nylon 6 nanofiber mats were prepared by an electrospinning-electrospraying hybrid process, The electrospinning of polymer solution and electrospraying of ZnO particles were carried out simultaneously such that the ZnO nanoparticles were dispersed on the surface of Nylon 6 nanofibers. The prepared ZnO/Nylon 6 nanofiber mats were tested for detoxifying characteristics against simulants of C-B agents. The results showed that ZnO/Nylon 6 functional nanofiber mats exhibited good detoxification action against paraoxon and have antibacterial efficiency over 99.99% against both the gram-negative E. coli and gram positive B. cereus bacteria. iii) Improving adhesion of electrospun nanofiber mat onto woven fabric by plasma pretreatment of substrate fabric and plasma-electrospinning hybrid process Electrospun nanofibers were deposited onto plasma-pretreated woven fabric to improve the adhesion. In addition, the plasma-electrospinning hybrid process was developed and used in which the nanofibers were subjected to in-situ plasma treatment during electrospinning. The effects of plasma treatement on substrate fabric and electrospun fibers were characterized by water contact angle test, XPS analyses. The improvement of nanofiber adhesive properties on fabric substrate was evaluated by peel test, flex resistance test and abrasion resistance test. The test results showed that the plasma treatment caused introduction of active chemical groups on substrate fabric and electrospun nanofibers. These active chemical assisted in possible cross-linking formation between nanofiber mat and substrate fabric, and this hypothesis was supported by improved adhesion strength, flex resistance and abrasion resistance of nanofiber mat.

Modular and efficient ozone systems based on massively parallel chemical processing in microchannel plasma arrays: performance and commercialization

NASA Astrophysics Data System (ADS)

Kim, M.-H.; Cho, J. H.; Park, S.-J.; Eden, J. G.

2017-08-01

Plasmachemical systems based on the production of a specific molecule (O3) in literally thousands of microchannel plasmas simultaneously have been demonstrated, developed and engineered over the past seven years, and commercialized. At the heart of this new plasma technology is the plasma chip, a flat aluminum strip fabricated by photolithographic and wet chemical processes and comprising 24-48 channels, micromachined into nanoporous aluminum oxide, with embedded electrodes. By integrating 4-6 chips into a module, the mass output of an ozone microplasma system is scaled linearly with the number of modules operating in parallel. A 115 g/hr (2.7 kg/day) ozone system, for example, is realized by the combined output of 18 modules comprising 72 chips and 1,800 microchannels. The implications of this plasma processing architecture for scaling ozone production capability, and reducing capital and service costs when introducing redundancy into the system, are profound. In contrast to conventional ozone generator technology, microplasma systems operate reliably (albeit with reduced output) in ambient air and humidity levels up to 90%, a characteristic attributable to the water adsorption/desorption properties and electrical breakdown strength of nanoporous alumina. Extensive testing has documented chip and system lifetimes (MTBF) beyond 5,000 hours, and efficiencies >130 g/kWh when oxygen is the feedstock gas. Furthermore, the weight and volume of microplasma systems are a factor of 3-10 lower than those for conventional ozone systems of comparable output. Massively-parallel plasmachemical processing offers functionality, performance, and commercial value beyond that afforded by conventional technology, and is currently in operation in more than 30 countries worldwide.

Graphene Synthesis by Plasma-Enhanced CVD Growth with Ethanol

DOE PAGES

Campo, Teresa; Cotto, María; Márquez, Francisco; ...

2016-03-01

A modified route to synthesize graphene flakes is proposed using the Chemical Vapor Deposition (CVD) technique, by using copper substrates as supports. The carbon source used was ethanol, the synthesis temperature was 950°C and the pressure was controlled along the whole process. In this CVD synthesis process the incorporation of the carbon source was produced at low pressure and 950°C inducing the appearance of a plasma blue flash inside the quartz tube. Apparently, the presence of this plasma blue flash is required for obtaining graphene flakes. The synthesized graphene was characterized by different techniques, showing the presence of non-oxidized graphenemore » with high purity.« less

Deposition kinetics and characterization of stable ionomers from hexamethyldisiloxane and methacrylic acid by plasma enhanced chemical vapor deposition

DOE Office of Scientific and Technical Information (OSTI.GOV)

Urstöger, Georg; Resel, Roland; Coclite, Anna Maria, E-mail: anna.coclite@tugraz.at

2016-04-07

A novel ionomer of hexamethyldisiloxane and methacrylic acid was synthesized by plasma enhanced chemical vapor deposition (PECVD). The PECVD process, being solventless, allows mixing of monomers with very different solubilities, and for polymers formed at high deposition rates and with high structural stability (due to the high number of cross-links and covalent bonding to the substrate) to be obtained. A kinetic study over a large set of parameters was run with the aim of determining the optimal conditions for high stability and proton conductivity of the polymer layer. Copolymers with good stability over 6 months' time in air and watermore » were obtained, as demonstrated by ellipsometry, X-Ray reflectivity, and FT-IR spectroscopy. Stable coatings showed also proton conductivity as high as 1.1 ± 0.1 mS cm{sup −1}. Chemical analysis showed that due to the high molecular weight of the chosen precursors, it was possible to keep the plasma energy-input-per-mass low. This allowed limited precursor fragmentation and the functional groups of both monomers to be retained during the plasma polymerization.« less

Preparation and surface characterization of plasma-treated and biomolecular-micropatterned polymer substrates

NASA Astrophysics Data System (ADS)

Langowski, Bryan Alfred

A micropatterning process creates distinct microscale domains on substrate surfaces that differ from the surfaces' original chemical/physical properties. Numerous micropatterning methods exist, each having relative advantages and disadvantages in terms of cost, ease, reproducibility, and versatility. Polymeric surfaces micropatterned with biomolecules have many applications, but are specifically utilized in tissue engineering as cell scaffolds that attempt to controlled tissue generation in vivo and ex vivo. As the physical and chemical cues presented by micropatterned substrates control resulting cellular behavior, characterization of these cues via surface-sensitive analytical techniques is essential in developing cell scaffolds that mimic complex in vivo physicochemical environments. The initial focus of this thesis is the chemical and physical characterization of plasma-treated, microcontact-printed (muCP) polymeric substrates used to direct nerve cell behavior. Unmodified and oxygen plasma-treated poly(methyl methacrylate) (PMMA) substrates were analyzed by surface sensitive techniques to monitor plasma-induced chemical and physical modifications. Additionally, protein-micropattern homogeneity and size were microscopically evaluated. Lastly, poly(dimethylsiloxane) (PDMS) stamps and contaminated PMMA substrates were characterized by spectroscopic and microscopic methods to identify a contamination source during microcontact printing. The final focus of this thesis is the development of microscale plasma-initiated patterning (muPIP) as a versatile, reproducible micropatterning method. Using muPIP, polymeric substrates were micropatterned with several biologically relevant inks. Polymeric substrates were characterized following muPIP by surface-sensitive techniques to identify the technique's underlying physical and chemical bases. In addition, neural stem cell response to muPIP-generated laminin micropatterns was microscopically and biologically evaluated. Finally, enhanced versatility of muPIP in generating microscale poly-L-lysine gradients was demonstrated.

Wettability and XPS analyses of nickel-phosphorus surfaces after plasma treatment: An efficient approach for surface qualification in mechatronic processes

NASA Astrophysics Data System (ADS)

Vivet, L.; Joudrier, A.-L.; Bouttemy, M.; Vigneron, J.; Tan, K. L.; Morelle, J. M.; Etcheberry, A.; Chalumeau, L.

2013-06-01

Electroless nickel-high-phosphorus Ni-P plating is known for its physical properties. In case of electronic and mechatronic assembly processes achieved under ambient conditions the wettability of the Ni-P layer under ambient temperature and ambient air stays a point of surface quality investigation. This contribution will be devoted to the study of the surface properties of Ni-P films for which we performed air plasma treatment. We focus our attention on the evolution of the surface wettability, using the classical sessile drop technique. Interpreting the results with the OWRK model we extract the polar and disperse surface tension components from which we deduced typical evolution of the surface properties with the different treatment settings. By controlling the variations of the parameters of the plasma exposure we are able to change the responses of our Ni-P sample from total hydrophobic to total hydrophilic behaviours. All the intermediate states can be reached by adapting the treatment parameters. So it is demonstrated that the apparent Ni-P surface properties can be fully adapted and the surface setting can be well characterized by wettability measurements. To deep our knowledge of the surface modifications induced by plasma we performed parallel SEM and XPS analyses which provide informations on the structure and the chemical composition of the surface for each set of treatment parameters. Using this double approach we were able to propose a correlation between the evolution of surface chemical composition and surface wettability which are completely governed by the plasma treatment conditions. Chemical parameters as the elimination of the carbon contamination, the progressive surface oxidation, and the slight incorporation of nitrogen due to the air plasma interaction are well associated with the evolution of the wettability properties. So a complete engineering for the Ni-P surface preparation has been established. The sessile drop method can be considered as a very efficient method to propose qualification of treatments onto Ni-P surfaces before performing electronic and mechatronic assembly processes that are achieved under ambient conditions.

Effects of Deposition Parameters on Thin Film Properties of Silicon-Based Electronic Materials Deposited by Remote Plasma-Enhanced Chemical-Vapor Deposition

NASA Astrophysics Data System (ADS)

Theil, Jeremy Alfred

The motivation of this thesis is to discuss the major issues of remote plasma enhanced chemical vapor deposition (remote PECVD) that affect the properties Si-based thin films. In order to define the issues required for process optimization, the behavior of remote PECVD process must be understood. The remote PECVD process is defined as having four segments: (1) plasma generation, (2) excited species extraction, (3) excited species/downstream gas mixing, and (4) surface reaction. The double Langmuir probe technique is employed to examine plasma parameters under 13.56 MHz and 2.54 GHz excitation. Optical emission spectroscopy is used to determine changes in the excited states of radiating species in the plasma afterglow. Mass spectrometry is used to determine the excitation and consumption of process gases within the reactor during film growth. Various analytical techniques such as infrared absorption spectroscopy, (ir), high resolution transmission electron microscopy, (HRTEM), and reflected high energy electron diffraction, (RHEED), are used to ascertain film properties. The results of the Langmuir probe show that plasma coupling is frequency dependent and that the capacitive coupling mode is characterized by orders of magnitude higher electron densities in the reactor than inductive coupling. These differences can be manifested in the degree to which a hydrogenated amorphous silicon, a-Si:H, component co-deposition reaction affects film stoichiometry. Mass spectrometry shows that there is an additional excitation source in the downstream glow. In addition the growth of microcrystalline silicon, muc-Si, is correlated with the decrease in the production of disilane and heavier Si-containing species. Chloronium, H_2 Cl^{+}, a super acid ion is identified for the first time in a CVD reactor. It forms from plasma fragmentation of SiH_2 Cl_2, and H_2 . Addition of impurity gases was shown not to affect the electron temperature of the plasma. By products of deposition reactions can affect film properties by post -deposition reactions with the film. In the case of SiO _2 film growth, residual H _2O is shown to create OH groups within the film by reacting with distorted Si-O-Si bonding groups.

The influence of incorporating MgO into Ni-based cermets by plasma spraying on anode microstructural and chemical stability in dry methane

NASA Astrophysics Data System (ADS)

Lay, E.; Metcalfe, C.; Kesler, O.

2012-11-01

The Solution Precursor Plasma Spray (SPPS) process was successfully used to deposit cermet coatings that exhibit fine microstructures with high surface area. MgO addition in Ni-YSZ and Ni-SDC cermets results in (Ni,Mg)O solid solution formation, and nickel particles after reduction are finer than in coatings without magnesia. The influence of MgO on the chemical stability of cermets in anodic operating conditions is discussed. It was found that a sufficient amount of magnesia addition (Ni0.9(MgO)0.1) helps to reduce carbon deposition in dry methane.

Evolution of the Solar System

NASA Technical Reports Server (NTRS)

Alfven, H.; Arrhenius, G.

1976-01-01

The origin and evolution of the solar system are analyzed. Physical processes are first discussed, followed by experimental studies of plasma-solid reactions and chemical and mineralogical analyses of meteorites and lunar and terrestrial samples.

Infrared control coating of thin film devices

DOE Office of Scientific and Technical Information (OSTI.GOV)

Berland, Brian Spencer; Stowell, Jr., Michael Wayne; Hollingsworth, Russell

Systems and methods for creating an infrared-control coated thin film device with certain visible light transmittance and infrared reflectance properties are disclosed. The device may be made using various techniques including physical vapor deposition, chemical vapor deposition, thermal evaporation, pulsed laser deposition, sputter deposition, and sol-gel processes. In particular, a pulsed energy microwave plasma enhanced chemical vapor deposition process may be used. Production of the device may occur at speeds greater than 50 Angstroms/second and temperatures lower than 200.degree. C.

Atmospheric-Pressure Plasma Interaction with Soft Materials as Fundamental Processes in Plasma Medicine.

PubMed

Takenaka, Kosuke; Miyazaki, Atsushi; Uchida, Giichiro; Setsuhara, Yuichi

2015-03-01

Molecular-structure variation of organic materials irradiated with atmospheric pressure He plasma jet have been investigated. Optical emission spectrum in the atmospheric-pressure He plasma jet has been measured. The spectrum shows considerable emissions of He lines, and the emission of O and N radicals attributed to air. Variation in molecular structure of Polyethylene terephthalate (PET) film surface irradiated with the atmospheric-pressure He plasma jet has been observed via X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FT-IR). These results via XPS and FT-IR indicate that the PET surface irradiated with the atmospheric-pressure He plasma jet was oxidized by chemical and/or physical effect due to irradiation of active species.

Characterizations of GaN film growth by ECR plasma chemical vapor deposition

NASA Astrophysics Data System (ADS)

Fu, Silie; Chen, Junfang; Zhang, Hongbin; Guo, Chaofen; Li, Wei; Zhao, Wenfen

2009-06-01

The electron cyclotron resonance plasma-enhanced metalorganic chemical vapor deposition technology (ECR-MOPECVD) is adopted to grow GaN films on (0 0 0 1) α-Al2O3 substrate. The gas sources are pure N2 and trimethylgallium (TMG). Optical emission spectroscopy (OES) and thermodynamic analysis of GaN growth are applied to understand the GaN growth process. The OES of ECR plasma shows that TMG is significantly dissociated in ECR plasma. Reactants N and Ga in the plasma, obtained easily under the self-heating condition, are essential for the GaN growth. They contribute to the realization of GaN film growth at a relatively low temperature. The thermodynamic study shows that the driving force for the GaN growth is high when N2:TMG>1. Furthermore, higher N2:TMG flow ratio makes the GaN growth easier. Finally, X-ray diffraction, photoluminescence, and atomic force microscope are applied to investigate crystal quality, morphology, and roughness of the GaN films. The results demonstrate that the ECR-MOPECVD technology is favorable for depositing GaN films at low temperatures.

Combustion flame-plasma hybrid reactor systems, and chemical reactant sources

DOEpatents

Kong, Peter C

2013-11-26

Combustion flame-plasma hybrid reactor systems, chemical reactant sources, and related methods are disclosed. In one embodiment, a combustion flame-plasma hybrid reactor system comprising a reaction chamber, a combustion torch positioned to direct a flame into the reaction chamber, and one or more reactant feed assemblies configured to electrically energize at least one electrically conductive solid reactant structure to form a plasma and feed each electrically conductive solid reactant structure into the plasma to form at least one product is disclosed. In an additional embodiment, a chemical reactant source for a combustion flame-plasma hybrid reactor comprising an elongated electrically conductive reactant structure consisting essentially of at least one chemical reactant is disclosed. In further embodiments, methods of forming a chemical reactant source and methods of chemically converting at least one reactant into at least one product are disclosed.

The response of the ionosphere to the injection of chemically reactive vapors

NASA Technical Reports Server (NTRS)

Bernhardt, P. A.

1976-01-01

As a gas released in the ionosphere expands, it is rapidly cooled. When the vapor becomes sufficiently tenuous, it is reheated by collisions with the ambient atmosphere and its flow is then governed by diffusive expansion. As the injected gas becomes well mixed with the plasma, a hole is created by chemical processes. In the case of diatomic hydrogen release, depression of the electron concentrations is governed by the charge exchange reaction between oxygen ions and hydrogen, producing positive hydroxyl ions. Hydroxyl ions rapidly react with the electron gas to produce excited oxygen and hydrogen atoms. Enhanced airglow emissions result from the transition of the excited atoms to lower energy states. The electron temperature in the depleted region rises sharply causing a thermal expansion of the plasma and a further reduction in the local plasma concentration.

Flow-field differences and electromagnetic-field properties of air and N2 inductively coupled plasmas

NASA Astrophysics Data System (ADS)

Yu, Minghao; Yamada, Kazuhiko; Takahashi, Yusuke; Liu, Kai; Zhao, Tong

2016-12-01

A numerical model for simulating air and nitrogen inductively coupled plasmas (ICPs) was developed considering thermochemical nonequilibrium and the third-order electron transport properties. A modified far-field electromagnetic model was introduced and tightly coupled with the flow field equations to describe the Joule heating and inductive discharge phenomena. In total, 11 species and 49 chemical reactions of air, which include 5 species and 8 chemical reactions of nitrogen, were employed to model the chemical reaction process. The internal energy transfers among translational, vibrational, rotational, and electronic energy modes of chemical species were taken into account to study thermal nonequilibrium effects. The low-Reynolds number Abe-Kondoh-Nagano k-ɛ turbulence model was employed to consider the turbulent heat transfer. In this study, the fundamental characteristics of an ICP flow, such as the weak ionization, high temperature but low velocity in the torch, and wide area of the plasma plume, were reproduced by the developed numerical model. The flow field differences between the air and nitrogen ICP flows inside the 10-kW ICP wind tunnel were made clear. The interactions between the electromagnetic and flow fields were also revealed for an inductive discharge.

Topographic, optical and chemical properties of zinc particle coatings deposited by means of atmospheric pressure plasma

NASA Astrophysics Data System (ADS)

Wallenhorst, L. M.; Loewenthal, L.; Avramidis, G.; Gerhard, C.; Militz, H.; Ohms, G.; Viöl, W.

2017-07-01

In this research, topographic, optical and chemical properties of zinc oxide layers deposited by a cold plasma-spray process were measured. Here, zinc micro particles were fed to the afterglow of a plasma spark discharge whereas the substrates were placed in a quite cold zone of the effluent plasma jet. In this vein, almost closed layers were realised on different samples. As ascertained by laser scanning and atomic force microscopic measurements the particle size of the basic layer is in the nanometre scale. Additionally, larger particles and agglomerates were found on its top. The results indicate a partial plasma-induced diminishment of the initial particles, most probably due to melting or vaporisation. It is further shown that the plasma gives rise to an increased oxidation of such particles as confirmed by X-ray photoelectron spectroscopy. Quantitative analysis of the resulting mixed layer was performed. It is shown that the deposited layers consist of zinc oxide and elemental zinc in approximately equal shares. In addition, the layer's band gap energy was determined by spectroscopic analysis. Here, considerable UV blocking properties of the deposited layers were observed. Possible underlying effects as well as potential applications are presented.

Particle formation in SiOx film deposition by low frequency plasma enhanced chemical vapor deposition

NASA Astrophysics Data System (ADS)

Yamaguchi, Tomoyo; Sakamoto, Naoshi; Shimozuma, Mitsuo; Yoshino, Masaki; Tagashira, Hiroaki

1998-01-01

Dust particle formation dynamics in the process of SiOx film deposition from a SiH4 and N2O gas mixture by a low frequency plasma enhanced chemical vapor deposition have been investigated using scanning electron microscopy and laser light scattering. The deposited films are confirmed to be SiOx from the measurements of Auger electron spectroscopy, x-ray photoelectron spectroscopy, and Fourier transform infrared spectroscopy. It is observed by scanning electron microscopy that particles are deposited on Si substrate at the plasma power frequency f=5 kHz and above both with and without substrate heating (400 °C), while no particle is deposited below f=1 kHz. Moreover, the laser light scattering indicates that particles are generated at the plasma power frequency of f=3 kHz and above in the gas phase, and that they are not generated in the gas phase at below f=3 kHz. Properties (the refractive index, resistivity, and Vickers hardness) of the films with particles are inferior to those of the films without particles. This article has revealed experimentally the effect of plasma power frequency on SiOx particle formation and makes a contribution to the explication of the particle formation mechanism. We suggest that high-quality film deposition with the low frequency plasma enhanced chemical vapor deposition method is attained at f=1 kHz or less without substrate heating.

Analysis and utilization of plasma treated water for food and agricultural interest

NASA Astrophysics Data System (ADS)

Park, Sanghoo; Lim, Youbong; Park, Joo Young; Choe, Wonho; Kim, Hyun-Joo; Yong, Hae In; Jo, Cheorun; Jung, Samooel

2015-09-01

Attention on aqueous chemical species produced in plasma-treated solutions through plasma-liquid interactions has been increased because of its strong relation to bio/medical and food applications. The long-lived and reactive oxygen and nitrogen species such as hydrogen peroxide, ozone, superoxide anion, and oxyacids play a crucial role in those applications. The plasma treatment brings about absorption of these species into the target liquid and also induces changes in liquid characteristics and composition via photolysis by plasma UV emission and post-discharge reactions. In this presentation, we discuss the result of our investigation of the chemical properties related to the two main oxyacids, HNO2 and HNO3, in plasma treated water (PTW). Water was treated in close proximity by our SDBD system developed specifically to meet the application requirements. The chemical properties of the solution varied gradually over the treatment time and storage time. Here we report the result of our experiment, theoretical analysis, and their consistency. Furthermore, the dependence of the nitrite ion production yield on the dissipated power, treatment time, and dielectric material will be discussed. Based on the revealed fundamental characteristics, the utilization of PTW in the meat curing process as one of the nitrite sources will be briefly demonstrated. In terms of sausage quality, there were no noticeable effects of PTW on the total aerobic bacteria counts, color, and peroxide values of sausages compared with those using celery powder and sodium nitrite.

In-liquid arc plasma jet and its application to phenol degradation

NASA Astrophysics Data System (ADS)

Liu, Jing-Lin; Park, Hyun-Woo; Hamdan, Ahmad; Cha, Min Suk

2018-03-01

We present a new method for achieving chemical reactions induced by plasmas with liquids—an in-liquid arc plasma jet system—designed to have a few advantages over the existing methods. High-speed imaging and optical emission spectroscopy were adopted to highlight the physical aspects of the in-liquid arc plasma jet system, and the feasibility of the system was investigated in a wastewater treatment case with phenol as the model contaminant. We found that the specific energy input is a reasonable parameter by which to characterize the overall process. The phenol removal reaction could be modeled as a pseudo-first-order reaction, and the reaction constant became smaller as the phenol concentration increased. However, complete decomposition of the phenol into water and carbon dioxide required very high energy because the final intermediate, oxalic acid, is relatively stable. Detailed chemical and physical analyses, including byproducts, ions, solution acidity, and conductivity, were conducted to evaluate this new method for use in the appropriate applications.

Plasma jet printing for flexible substrates

DOE Office of Scientific and Technical Information (OSTI.GOV)

Gandhiraman, Ram P.; Singh, Eric; Diaz-Cartagena, Diana C.

2016-03-21

Recent interest in flexible electronics and wearable devices has created a demand for fast and highly repeatable printing processes suitable for device manufacturing. Robust printing technology is critical for the integration of sensors and other devices on flexible substrates such as paper and textile. An atmospheric pressure plasma-based printing process has been developed to deposit different types of nanomaterials on flexible substrates. Multiwalled carbon nanotubes were deposited on paper to demonstrate site-selective deposition as well as direct printing without any type of patterning. Plasma-printed nanotubes were compared with non-plasma-printed samples under similar gas flow and other experimental conditions and foundmore » to be denser with higher conductivity. The utility of the nanotubes on the paper substrate as a biosensor and chemical sensor was demonstrated by the detection of dopamine, a neurotransmitter, and ammonia, respectively.« less

Aerosol chemistry in Titan's ionosphere: simultaneous growth and etching processes

NASA Astrophysics Data System (ADS)

Carrasco, Nathalie; Cernogora, Guy; Jomard, François; Etcheberry, Arnaud; Vigneron, Jackie

2016-10-01

Since the Cassini-CAPS measurements, organic aerosols are known to be present and formed at high altitudes in the diluted and partially ionized medium that is Titan's ionosphere [1]. This unexpected chemistry can be further investigated in the laboratory with plasma experiments simulating the complex ion-neutral chemistry starting from N2-CH4 [2]. Two sorts of solid organic samples can be produced in laboratory experiments simulating Titan's atmospheric reactivity: grains in the volume and thin films on the reactor walls. We expect that grains are more representative of Titan's atmospheric aerosols, but films are used to provide optical indices for radiative models of Titan's atmosphere.The aim of the present study is to address if these two sorts of analogues are chemically equivalent or not, when produced in the same N2-CH4 plasma discharge. The chemical compositions of both these materials are measured by using elemental analysis, XPS analysis and Secondary Ion Mass Spectrometry. We find that films are homogeneous but significantly less rich in nitrogen and hydrogen than grains produced in the same experimental conditions. This surprising difference in their chemical compositions is explained by the efficient etching occurring on the films, which stay in the discharge during the whole plasma duration, whereas the grains are ejected after a few minutes [3]. The impact for our understanding of Titan's aerosols chemical composition is important. Our study shows that chemical growth and etching process are simultaneously at stake in Titan's ionosphere. The more the aerosols stay in the ionosphere, the more graphitized they get through etching process. In order to infer Titan's aerosols composition, our work highlights a need for constraints on the residence time of aerosols in Titan's ionosphere. [1] Waite et al. (2009) Science , 316, p. 870[2] Szopa et al. (2006) PSS, 54, p. 394[3] Carrasco et al. (2016) PSS, 128, p. 52

Cold plasma rapid decontamination of food contact surfaces contaminated with Salmonella biofilms.

PubMed

Niemira, Brendan A; Boyd, Glenn; Sites, Joseph

2014-05-01

Cross-contamination of foods from persistent pathogen reservoirs is a known risk factor in processing environments. Industry requires a rapid, waterless, zero-contact, chemical-free method for removing pathogens from food contact surfaces. Cold plasma was tested for its ability to inactivate Salmonella biofilms. A 3-strain Salmonella culture was grown to form adherent biofilms for 24, 48, or 72 h on a test surface (glass slides). These were placed on a conveyor belt and passed at various line speeds to provide exposure times of 5, 10, or 15 s. The test plate was either 5 or 7.5 cm under a plasma jet emitter operating at 1 atm using filtered air as the feed gas. The frequency of high-voltage electricity was varied from 23 to 48 kHz. At the closer spacing (5 cm), cold plasma reduced Salmonella biofilms by up to 1.57 log CFU/mL (5 s), 1.82 log CFU/mL (10 s), and 2.13 log CFU/mL (15 s). Increasing the distance to 7.5 cm generally reduced the efficacy of the 15 s treatment, but had variable effects on the 5 and 10 s treatments. Variation of the high-voltage electricity had a greater effect on 10 and 15 s treatments, particularly at the 7.5 cm spacing. For each combination of time, distance, and frequency, Salmonella biofilms of 24, 48, and 72 h growth responded consistently with each other. The results show that short treatments with cold plasma yielded up to a 2.13 log reduction of a durable form of Salmonella contamination on a model food contact surface. This technology shows promise as a possible tool for rapid disinfection of materials associated with food processing. Pathogens such as Salmonella can form chemical-resistant biofilms, making them difficult to remove from food contact surfaces. A 15 s treatment with cold plasma reduced mature Salmonella biofilms by up to 2.13 log CFU/mL (99.3%). This contact-free, waterless method uses no chemical sanitizers. Cold plasma may therefore have a practical application for conveyor belts, equipment, and other food contact surfaces where a rapid, dry antimicrobial process is required. © 2014 Institute of Food Technologists®

Superhydrophobic nanostructured Kapton® surfaces fabricated through Ar + O2 plasma treatment: Effects of different environments on wetting behaviour

NASA Astrophysics Data System (ADS)

Barshilia, Harish C.; Ananth, A.; Gupta, Nitant; Anandan, C.

2013-03-01

Kapton® [poly (4,4'-oxy diphenylene pyromellitimide)] polyimides have widespread usage in semiconductor devices, solar arrays, protective coatings and space applications, due to their excellent chemical and physical properties. In addition to their inherent properties, imparting superhydrophobicity on these surfaces will be an added advantage. Present work describes the usage of Ar + O2 plasma treatment for the preparation of superhydrophobic Kapton® surfaces. Immediately after the plasma treatment, the surfaces showed superhydrophilicity as a result of high energy dangling bonds and polar group concentration. But the samples kept in low vacuum for 48 h exhibited superhydrophobicity with high water contact angles (>150°). It is found that the post plasma treatment process, called ageing, especially in low vacuum plays an important role in delivering superhydrophobic property to Kapton®. Field emission scanning electron microscopy and atomic force microscopy were used to probe the physical changes in the surface of the Kapton®. The surfaces showed formation of nano-feathers and nano-tussock microstructures with variation in surface roughness against plasma treatment time. A thorough chemical investigation was performed using Fourier transform infrared spectroscopy and micro-Raman spectroscopy, which revealed changes in the surface of the Ar + O2 plasma treated Kapton®. Surface chemical species of Kapton® were confirmed again by X-ray photoelectron spectroscopy spectra for untreated surfaces whereas Ar + O2 plasma treated samples showed the de-bonding and re-organization of structural elements. Creation of surface roughness plays a dominant role in the contribution of superhydrophobicity to Kapton® apart from the surface modifications due to Ar + O2 plasma treatment and ageing in low vacuum.

Real-time plasma control in a dual-frequency, confined plasma etcher

NASA Astrophysics Data System (ADS)

Milosavljević, V.; Ellingboe, A. R.; Gaman, C.; Ringwood, J. V.

2008-04-01

The physics issues of developing model-based control of plasma etching are presented. A novel methodology for incorporating real-time model-based control of plasma processing systems is developed. The methodology is developed for control of two dependent variables (ion flux and chemical densities) by two independent controls (27 MHz power and O2 flow). A phenomenological physics model of the nonlinear coupling between the independent controls and the dependent variables of the plasma is presented. By using a design of experiment, the functional dependencies of the response surface are determined. In conjunction with the physical model, the dependencies are used to deconvolve the sensor signals onto the control inputs, allowing compensation of the interaction between control paths. The compensated sensor signals and compensated set-points are then used as inputs to proportional-integral-derivative controllers to adjust radio frequency power and oxygen flow to yield the desired ion flux and chemical density. To illustrate the methodology, model-based real-time control is realized in a commercial semiconductor dielectric etch chamber. The two radio frequency symmetric diode operates with typical commercial fluorocarbon feed-gas mixtures (Ar/O2/C4F8). Key parameters for dielectric etching are known to include ion flux to the surface and surface flux of oxygen containing species. Control is demonstrated using diagnostics of electrode-surface ion current, and chemical densities of O, O2, and CO measured by optical emission spectrometry and/or mass spectrometry. Using our model-based real-time control, the set-point tracking accuracy to changes in chemical species density and ion flux is enhanced.

Synthesis of silane and silicon in a non-equilibrium plasma jet

NASA Technical Reports Server (NTRS)

Calcote, H. F.; Felder, W.

1977-01-01

The feasibility of using a non-equilibrium hydrogen plasma jet as a chemical synthesis tool was investigated. Four possible processes were identified for further study: (1) production of polycrystalline silicon photovoltaic surfaces, (2) production of SiHCl3 from SiCl4, (3) production of SiH4 from SiHCl3, and (4) purification of SiCl4 by metal impurity nucleation. The most striking result was the recognition that the strongly adhering silicon films, amorphous or polycrystalline, produced in our studies could be the basis for preparing a photovoltaic surface directly; this process has potential advantages over other vapor deposition processes.

Study of evaporating the irradiated graphite in equilibrium low-temperature plasma

NASA Astrophysics Data System (ADS)

Bespala, E. V.; Novoselov, I. Yu.; Pavlyuk, A. O.; Kotlyarevskiy, S. G.

2018-01-01

The paper describes a problem of accumulation of irradiated graphite due to operation of uranium-graphite nuclear reactors. The main noncarbon contaminants that contribute to the overall activity of graphite elements are iso-topes 137Cs, 60Co, 90Sr, 36Cl, and 3H. A method was developed for processing of irradiated graphite ensuring the volu-metric decontamination of samples. The calculation results are presented for equilibrium composition of plasma-chemical reactions in systems "irradiated graphite-argon" and "irradiated graphite-helium" for a wide range of tem-peratures. The paper describes a developed mathematical model for the process of purification of a porous graphite surface treated by equilibrium low-temperature plasma. The simulation results are presented for the rate of sublimation of radioactive contaminants as a function of plasma temperature and plasma flow velocity when different plasma-forming gases are used. The extraction coefficient for the contaminant 137Cs from the outer side of graphite pores was calculated. The calculations demonstrated the advantages of using a lighter plasma forming gas, i.e., helium.

Methane chemistry involved in a low-pressure electron cyclotron wave resonant plasma discharge

NASA Astrophysics Data System (ADS)

Morrison, N. A.; William, C.; Milne, W. I.

2003-12-01

Radio frequency (rf) generated methane plasmas are commonly employed in the deposition of hydrogenated amorphous carbon (a-C:H) thin films. However, very little is known about the rf discharge chemistry and how it relates to the deposition process. Consequently, we have characterized a low-pressure methane plasma and compared the results with those obtained theoretically by considering the steady-state kinetics of the chemical processes present in a low-pressure plasma reactor, in order to elucidate the dominant reaction channels responsible for the generation of the active precursors required for film growth. Mass spectrometry measurements of the gas phase indicated little variation in the plasma chemistry with increasing electron temperature. This was later attributed to the partial saturation of the electron-impact dissociation and ionization rate constants at electron temperatures in excess of ˜4 eV. The ion densities in the plasma were also found to be strongly dependent upon the parent neutral concentration in the gas phase, indicating that direct electron-impact reactions exerted greater influence on the plasma chemistry than secondary ion-neutral reactions.

Effects of pulse frequency of input power on the physical and chemical properties of pulsed streamer discharge plasmas in water

NASA Astrophysics Data System (ADS)

Ruma; Lukes, P.; Aoki, N.; Spetlikova, E.; Hosseini, S. H. R.; Sakugawa, T.; Akiyama, H.

2013-03-01

A repetitive pulsed-power modulator, which employs a magnetic pulse compression circuit with a high-speed thyristor switch, was used to study the effects of the pulse repetition rate of input power on the physical and chemical properties of pulsed discharges in water. Positive high-voltage pulses of 20 kV with repetition rates of up to 1 kHz were used to generate a discharge in water using the point-to-plane electrode geometry. By varying the pulse repetition rate, two distinct modes of the discharge plasma were formed in water. The first mode was characterized by the formation of a corona-like discharge propagating through water in the form of streamer channels. The second mode was formed typically above 500 Hz, when the formation of streamer channels in water was suppressed and all plasmas occurred inside a spheroidal aggregate of very fine gas bubbles surrounding the tip of the high-voltage electrode. The production of hydrogen peroxide, degradation of organic dye Acid Orange 7 (AO7) and inactivation of bacteria Escherichia coli by the discharge in water were studied under different discharge plasma modes in dependence on the pulse repetition rate of input power. The efficiency of both chemical and biocidal processes induced by the plasma in water decreased significantly with pulse repetition rates above 500 Hz.

Investigating Efficient Tar Management from Biomass and Waste to Energy Gasification Processes

DTIC Science & Technology

2015-04-01

Non-thermal plasma systems, including low-pressure glow, radio frequency and corona discharges , offer high chemical selectivity and relatively...Chemosphere 2007;68(10):1821-9; Van Durme, Jim, et. al; Abatement and degredation pathways of toluene of indoor air by positive corona discharge . xi... discharges including high temperature plasma torchesviii, microwaveix, coronax and as related to this study, gliding arc nonthermal plasmaxi and catalystsxii

Minimum reaction network necessary to describe Ar/CF4 plasma etch

NASA Astrophysics Data System (ADS)

Helpert, Sofia; Chopra, Meghali; Bonnecaze, Roger T.

2018-03-01

Predicting the etch and deposition profiles created using plasma processes is challenging due to the complexity of plasma discharges and plasma-surface interactions. Volume-averaged global models allow for efficient prediction of important processing parameters and provide a means to quickly determine the effect of a variety of process inputs on the plasma discharge. However, global models are limited based on simplifying assumptions to describe the chemical reaction network. Here a database of 128 reactions is compiled and their corresponding rate constants collected from 24 sources for an Ar/CF4 plasma using the platform RODEo (Recipe Optimization for Deposition and Etching). Six different reaction sets were tested which employed anywhere from 12 to all 128 reactions to evaluate the impact of the reaction database on particle species densities and electron temperature. Because many the reactions used in our database had conflicting rate constants as reported in literature, we also present a method to deal with those uncertainties when constructing the model which includes weighting each reaction rate and filtering outliers. By analyzing the link between a reaction's rate constant and its impact on the predicted plasma densities and electron temperatures, we determine the conditions at which a reaction is deemed necessary to the plasma model. The results of this study provide a foundation for determining which minimal set of reactions must be included in the reaction set of the plasma model.

Single liquid source plasma-enhanced metalorganic chemical vapor deposition of high-quality YBa2Cu3O(7-x) thin films

NASA Technical Reports Server (NTRS)

Zhang, Jiming; Gardiner, Robin A.; Kirlin, Peter S.; Boerstler, Robert W.; Steinbeck, John

1992-01-01

High quality YBa2Cu3O(7-x) films were grown in-situ on LaAlO3 (100) by a novel single liquid source plasma-enhanced metalorganic chemical vapor deposition process. The metalorganic complexes M(thd) (sub n), (thd = 2,2,6,6-tetramethyl-3,5-heptanedionate; M = Y, Ba, Cu) were dissolved in an organic solution and injected into a vaporizer immediately upstream of the reactor inlet. The single liquid source technique dramatically simplifies current CVD processing and can significantly improve the process reproducibility. X-ray diffraction measurements indicated that single phase, highly c-axis oriented YBa2Cu3O(7-x) was formed in-situ at substrate temperature 680 C. The as-deposited films exhibited a mirror-like surface, had transition temperature T(sub cO) approximately equal to 89 K, Delta T(sub c) less than 1 K, and Jc (77 K) = 10(exp 6) A/sq cm.

In Situ Chemical Modification of Schottky Barrier in Solution-Processed Zinc Tin Oxide Diode.

PubMed

Son, Youngbae; Li, Jiabo; Peterson, Rebecca L

2016-09-14

Here we present a novel in situ chemical modification process to form vertical Schottky diodes using palladium (Pd) rectifying bottom contacts, amorphous zinc tin oxide (Zn-Sn-O) semiconductor made via acetate-based solution process, and molybdenum top ohmic contacts. Using X-ray photoelectron spectroscopy depth profiling, we show that oxygen plasma treatment of Pd creates a PdOx interface layer, which is then reduced back to metallic Pd by in situ reactions during Zn-Sn-O film annealing. The plasma treatment ensures an oxygen-rich environment in the semiconductor near the Schottky barrier, reducing the level of oxygen-deficiency-related defects and improving the rectifying contact. Using this process, we achieve diodes with high forward current density exceeding 10(3)A cm(-2) at 1 V, rectification ratios of >10(2), and ideality factors of around 1.9. The measured diode current-voltage characteristics are compared to numerical simulations of thermionic field emission with sub-bandgap states in the semiconductor, which we attribute to spatial variations in metal stoichiometry of amorphous Zn-Sn-O. To the best of our knowledge, this is the first demonstration of vertical Schottky diodes using solution-processed amorphous metal oxide semiconductor. Furthermore, the in situ chemical modification method developed here can be adapted to tune interface properties in many other oxide devices.

Study of supersonic plasma technology jets

NASA Astrophysics Data System (ADS)

Selezneva, Svetlana; Gravelle, Denis; Boulos, Maher; van de Sanden, Richard; Schram, Dc

2001-10-01

Recently some new techniques using remote thermal plasma for thin film deposition and plasma chemistry processes were developed. These techniques include PECVD of diamonds, diamond-like and polymer films; a-C:H and a-Si:H films. The latter are of especial interest because of their applications for solar cell production industry. In remote plasma deposition, thermal plasma is formed by means of one of traditional plasma sources. The chamber pressure is reduced with the help of continuous pumping. In that way the flow is accelerated up to the supersonic speed. The plasma expansion is controlled using a specific torch nozzle design. To optimize the deposition process detailed knowledge about the gas dynamic structure of the jet and chemical kinetics mechanisms is required. In the paper, we show how the flow pattern and the character of the deviations from local thermodynamic equilibrium differs in plasmas generated by different plasma sources, such as induction plasma torch, traditional direct current arc and cascaded arc. We study the effects of the chamber pressure, nozzle design and carrier gas on the resulting plasma properties. The analysis is performed by means of numerical modeling using commercially available FLUENT program with incorporated user-defined subroutines for two-temperature model. The results of continuum mechanics approach are compared with that of the kinetic Monte Carlo method and with the experimental data.

Development of a 0.1 μm linewidth fabrication process for x-ray lithography with a laser plasma source

NASA Astrophysics Data System (ADS)

Bobkowski, Romuald; Fedosejevs, Robert; Broughton, James N.

1999-06-01

A process has been developed for the purpose of fabricating 0.1 micron linewidth interdigital electrode patterns based on proximity x-ray lithography using a laser-plasma source. Such patterns are required in the manufacture of surface acoustic wave devices. The x-ray lithography was carried out using emission form a Cu plasma produced by a 15Hz, 248nm KrF excimer laser. A temporally multiplexed 50ps duration seed pulse was used to extract the KrF laser energy producing a train of several 50ps pulses spaced approximately 2ns apart within each output pulse. Each short pulse within the train gave the high focal spot intensity required to achieve high efficiency emission of keV x-rays. The first stage of the overall process involves the fabrication of x-ray mask patterns on 1 micron thick Si3N4 membranes using 3-beam lithography followed by gold electroplating. The second stage involves x-ray exposure of a chemically amplified resist through the mask patterns to produce interdigital electrode patterns with 0.1 micron linewidth. Helium background gas and thin polycarbonate/aluminum filters are employed to prevent debris particles from the laser-plasma source form reaching the exposed sample. A computer control system fires the laser and monitors the x-ray flux from the laser-plasma source to insure the desired x-ray exposure is achieved at the resist. In order to reduce diffusion effects in the chemically amplified resist during the post exposure bake the temperature had to be reduced from that normally used. Good reproduction of 0.1 micron linewidth patterns into the x-ray resist was obtained once the exposure parameters and post exposure bake were optimized. A compact exposure station using flowing helium at atmospheric pressure has also been developed for the process, alleviating the need for a vacuum chamber. The details of the overall process and the compact exposure station will be presented.

Diagnostics of microwave assisted electron cyclotron resonance plasma source for surface modification of nylon 6

NASA Astrophysics Data System (ADS)

More, Supriya E.; Das, Partha Sarathi; Bansode, Avinash; Dhamale, Gayatri; Ghorui, S.; Bhoraskar, S. V.; Sahasrabudhe, S. N.; Mathe, Vikas L.

2018-01-01

Looking at the increasing scope of plasma processing of materials surface, here we present the development and diagnostics of a microwave assisted Electron Cyclotron Resonance (ECR) plasma system suitable for surface modification of polymers. Prior to the surface-treatment, a detailed diagnostic mapping of the plasma parameters throughout the reactor chamber was carried out by using single and double Langmuir probe measurements in Ar plasma. Conventional analysis of I-V curves as well as the elucidation form of the Electron Energy Distribution Function (EEDF) has become the source of calibration of plasma parameters in the reaction chamber. The high energy tail in the EEDF of electron temperature is seen to extend beyond 60 eV, at much larger distances from the ECR zone. This proves the suitability of the rector for plasma processing, since the electron energy is much beyond the threshold energy of bond breaking in most of the polymers. Nylon 6 is used as a representative candidate for surface processing in the presence of Ar, H2 + N2, and O2 plasma, treated at different locations inside the plasma chamber. In a typical case, the work of adhesion is seen to almost get doubled when treated with oxygen plasma. Morphology of the plasma treated surface and its hydrophilicity are discussed in view of the variation in electron density and electron temperature at these locations. Nano-protrusions arising from plasma treatment are set to be responsible for the hydrophobicity. Chemical sputtering and physical sputtering are seen to influence the surface morphology on account of sufficient electron energies and increased plasma potential.

Modeling of low pressure plasma sources for microelectronics fabrication

NASA Astrophysics Data System (ADS)

Agarwal, Ankur; Bera, Kallol; Kenney, Jason; Likhanskii, Alexandre; Rauf, Shahid

2017-10-01

Chemically reactive plasmas operating in the 1 mTorr-10 Torr pressure range are widely used for thin film processing in the semiconductor industry. Plasma modeling has come to play an important role in the design of these plasma processing systems. A number of 3-dimensional (3D) fluid and hybrid plasma modeling examples are used to illustrate the role of computational investigations in design of plasma processing hardware for applications such as ion implantation, deposition, and etching. A model for a rectangular inductively coupled plasma (ICP) source is described, which is employed as an ion source for ion implantation. It is shown that gas pressure strongly influences ion flux uniformity, which is determined by the balance between the location of plasma production and diffusion. The effect of chamber dimensions on plasma uniformity in a rectangular capacitively coupled plasma (CCP) is examined using an electromagnetic plasma model. Due to high pressure and small gap in this system, plasma uniformity is found to be primarily determined by the electric field profile in the sheath/pre-sheath region. A 3D model is utilized to investigate the confinement properties of a mesh in a cylindrical CCP. Results highlight the role of hole topology and size on the formation of localized hot-spots. A 3D electromagnetic plasma model for a cylindrical ICP is used to study inductive versus capacitive power coupling and how placement of ground return wires influences it. Finally, a 3D hybrid plasma model for an electron beam generated magnetized plasma is used to understand the role of reactor geometry on plasma uniformity in the presence of E  ×  B drift.

Spectroscopic study of low pressure, low temperature H2-CH4-CO2 microwave plasmas used for large area deposition of nanocrystalline diamond films. Part II: on plasma chemical processes

NASA Astrophysics Data System (ADS)

Nave, A. S. C.; Baudrillart, B.; Hamann, S.; Bénédic, F.; Lombardi, G.; Gicquel, A.; van Helden, J. H.; Röpcke, J.

2016-12-01

In a distributed antenna array (DAA) reactor, microwave H2 plasmas with admixtures of 2.5% CH4 and 1% CO2 used for the deposition of nanocrystalline diamond films have been studied by infrared laser absorption and optical emission spectroscopy (OES) techniques. The experiments were carried out in order to analyze the dependence of plasma chemical phenomena on power and pressure at relatively low pressures, up to 0.55 mbar, and power values, up to 3 kW. The evolution of the concentration of the methyl radical, CH3, of five stable molecules, CH4, CO2, CO, C2H2 and C2H6, and of vibrationally excited CO in the first and second hot band was monitored in the plasma processes by in situ infrared laser absorption spectroscopy using tunable lead salt diode lasers (TDL) and an external-cavity quantum cascade laser (EC-QCL) as radiation sources. OES was applied simultaneously to obtain complementary information about the degree of dissociation of the H2 precursor and of its gas temperature. The experimental results are presented in two separate parts. In Part I, the first paper in a two-part series, the measurement of the gas (T gas), rotational (T rot) and vibrational (T vib) temperatures of the various species in the complex plasma was the main focus of interest. Depending on the different plasma zones the gas temperature was found to range between about 360 and 1000 K inside the DAA reactor (Nave et al 2016 Plasma Sources Sci. Technol. 25 065002). In Part II, the present paper, taking into account the temperatures determined in the first paper, the concentrations of the various species, which were found to be in a range between 1011 and 1015 cm-3, are the focus of interest. The influence of the discharge parameters power and pressure on the molecular concentrations has been studied. To achieve further insight into general plasma chemical aspects the dissociation of the carbon precursor gases including their fragmentation and conversion to the reaction products has been analyzed in detail.

ATP-binding cassette-like transporters are involved in the transport of lignin precursors across plasma and vacuolar membranes

DOE Office of Scientific and Technical Information (OSTI.GOV)

Miao, Y.C.; Liu, C.

2010-12-28

Lignin is a complex biopolymer derived primarily from the condensation of three monomeric precursors, the monolignols. The synthesis of monolignols occurs in the cytoplasm. To reach the cell wall where they are oxidized and polymerized, they must be transported across the cell membrane. However, the molecular mechanisms underlying the transport process are unclear. There are conflicting views about whether the transport of these precursors occurs by passive diffusion or is an energized active process; further, we know little about what chemical forms are required. Using isolated plasma and vacuolar membrane vesicles prepared from Arabidopsis, together with applying different transporter inhibitorsmore » in the assays, we examined the uptake of monolignols and their derivatives by these native membrane vesicles. We demonstrate that the transport of lignin precursors across plasmalemma and their sequestration into vacuoles are ATP-dependent primary-transport processes, involving ATP-binding cassette-like transporters. Moreover, we show that both plasma and vacuolar membrane vesicles selectively transport different forms of lignin precursors. In the presence of ATP, the inverted plasma membrane vesicles preferentially take up monolignol aglycones, whereas the vacuolar vesicles are more specific for glucoconjugates, suggesting that the different ATP-binding cassette-like transporters recognize different chemical forms in conveying them to distinct sites, and that glucosylation of monolignols is necessary for their vacuolar storage but not required for direct transport into the cell wall in Arabidopsis.« less

Effects of chemical sympathectomy on the increases in plasma catecholamines and dopamine-beta-hydroxylase induced by forced immobilization and insulin-induced hypoglycemia: origin and fate of plasma dopamine-beta-hydroxylase.

PubMed

Israel, A S; Barbella, Y R; Cubeddu, L X

1982-06-01

The effect of acute stresses on plasma norepinephrine, epinephrine and dopamine-beta-hydroxylase (DBH) were evaluated in control and 6-hydroxydopamine-treated, awake cannulated guinea pigs. Forced immobolization for 1 hr caused a 3- and 5-fold increase in plasma DBH and norepinephrine, respectively. Pretreatment with 6-hydroxydopamine (23 mg/kg b.wt.i.a., 72 and 48 hr before stress) reduced by 70% the increase in plasma DBH and totally prevented the rise in plasma catecholamines evoked by the restraining stress. Injection of insulin (5 U/kg b.wt.i.a.) induced a 60% decrease in blood glucose, a 1-fold increase in plasma DBH and a selective 4-fold increase in plasma epinephrine; these effects were not modified by chemical sympathectomy. Our results indicate that forced immobilization and hypoglycemia produce a preferential activation of the sympathetic postganglionic nerves and of the adrenal medulla, respectively, and that in guinea pigs both stresses increase plasma DBH. The kinetics of disappearance of plasma DBH were studied after subjecting the guinea pigs for 1 hr to forced immobilization. Although 7 of 12 animals showed a biphasic rate of fall of plasma DBH, in each case there was a rapid initial fall possibly due to the "distribution" of the enzyme with a T1/2 of 1.65 hr. Similar findings were observed in 6-hydroxydopamine-treated guinea pigs. These results suggest that the distribution of DBH is the most important process in reducing the augmented plasma DBH levels elicited by a short-term stress and that this process is not dependent on the integrity of the sympathetic nerves nor on the adrenal or sympathetic origin of the enzyme. This study supports the view that the ratio, content of releasable DBH present in sympathetic nerves and adrenal glands/total circulating pool of DBH, is the factor that determines whether an increase in plasma DBH would occur in animals exposed to an acute stress.

The Impact of Plasma Treatment of Cercon® Zirconia Ceramics on Adhesion to Resin Composite Cements and Surface Properties.

PubMed

Tabari, Kasra; Hosseinpour, Sepanta; Mohammad-Rahimi, Hossein

2017-01-01

Introduction: In recent years, the use of ceramic base zirconia is considered in dentistry for all ceramic restorations because of its chemical stability, biocompatibility, and good compressive as well as flexural strength. However, due to its chemical stability, there is a challenge with dental bonding. Several studies have been done to improve zirconia bonding but they are not reliable. The purpose of this research is to study the effect of plasma treatment on bonding strength of zirconia. Methods: In this in vitro study, 180 zirconia discs' (thickness was 0.85-0.9 mm) surfaces were processed with plasma of oxygen, argon, air and oxygen-argon combination with 90-10 and 80-20 ratio (n=30 for each group) after being polished by sandblast. Surface modifications were assessed by measuring the contact angle, surface roughness, and topographical evaluations. Cylindrical Panavia f2 resin-cement and Diafill were used for microshear strength bond measurements. The data analysis was performed by SPSS 20.0 software and one-way analysis of variance (ANOVA) and Tukey test as the post hoc. Results: Plasma treatment in all groups significantly reduces contact angle compare with control ( P =0.001). Topographic evaluations revealed coarseness promotion occurred in all plasma treated groups which was significant when compared to control ( P <0.05), except argon plasma treated group that significantly decreased surface roughness ( P <0.05). In all treated groups, microshear bond strength increased, except oxygen treated plasma group which decreased this strength. Air and argon-oxygen combination (both groups) significantly increased microshear bond strength ( P <0.05). Conclusion: According to this research, plasmatic processing with dielectric barrier method in atmospheric pressure can increase zirconia bonding strength.

Plasma modification of starch.

PubMed

Zhu, Fan

2017-10-01

Plasma is a medium of unbound negative and positive particles with the overall electrical charge being roughly zero. Non-thermal plasma processing is an emerging green technology with great potential to improve the quality and microbial safety of various food materials. Starch is a major component of many food products and is an important ingredient for food and other industries. There has been increasing interest in utilizing plasma to modify the functionalities of starch through interactions with reactive species. This mini-review summarises the impact of plasma on composition, chemical and granular structures, physicochemical properties, and uses of starch. Structure-function relationships of starch components as affected by plasma modifications are discussed. Effect of plasma on the properties of wheat flour, which is a typical example of starch based complex food systems, is also reviewed. Future research directions on how to better utilise plasma to improve the functionalities of starch are suggested. Copyright © 2017 Elsevier Ltd. All rights reserved.

Design of a Uranium Dioxide Spheroidization System

NASA Technical Reports Server (NTRS)

Cavender, Daniel P.; Mireles, Omar R.; Frendi, Abdelkader

2013-01-01

The plasma spheroidization system (PSS) is the first process in the development of tungsten-uranium dioxide (W-UO2) fuel cermets. The PSS process improves particle spherocity and surface morphology for coating by chemical vapor deposition (CVD) process. Angular fully dense particles melt in an argon-hydrogen plasma jet at between 32-36 kW, and become spherical due to surface tension. Surrogate CeO2 powder was used in place of UO2 for system and process parameter development. Particles range in size from 100 - 50 microns in diameter. Student s t-test and hypothesis testing of two proportions statistical methods were applied to characterize and compare the spherocity of pre and post process powders. Particle spherocity was determined by irregularity parameter. Processed powders show great than 800% increase in the number of spherical particles over the stock powder with the mean spherocity only mildly improved. It is recommended that powders be processed two-three times in order to reach the desired spherocity, and that process parameters be optimized for a more narrow particles size range. Keywords: spherocity, spheroidization, plasma, uranium-dioxide, cermet, nuclear, propulsion

Determination of the profit rate of plasma treated production in the food sector

NASA Astrophysics Data System (ADS)

Gok, Elif Ceren; Uygun, Emre; Eren, Esin; Oksuz, Lutfi; Uygun Oksuz, Aysegul

2017-10-01

Recently, plasma is one of an emerging, green processing technologies used for diverse applications especially food industry. Plasma treatment proposes diverse opportunities in food industry such as surface decontamination, modification of surface properties and improvement in mass transfer with respect for foods and food-related compounds. Sometimes manufacturers use chemical treatment to demolish pathogenic flora, but its capabilities are rather limited. New methods of food sterilization consisting of ionizing radiation, exposure to magnetic fields, high-power ultrasonic treatment are needed expensive equipment or have not yet been developed for industrial use. Plasma could be used for the above mentioned reasons. In this study, the profit rate of plasma treated production in food sector was calculated.

Simulation of uranium and plutonium oxides compounds obtained in plasma

NASA Astrophysics Data System (ADS)

Novoselov, Ivan Yu.; Karengin, Alexander G.; Babaev, Renat G.

2018-03-01

The aim of this paper is to carry out thermodynamic simulation of mixed plutonium and uranium oxides compounds obtained after plasma treatment of plutonium and uranium nitrates and to determine optimal water-salt-organic mixture composition as well as conditions for their plasma treatment (temperature, air mass fraction). Authors conclude that it needs to complete the treatment of nitric solutions in form of water-salt-organic mixtures to guarantee energy saving obtainment of oxide compounds for mixed-oxide fuel and explain the choice of chemical composition of water-salt-organic mixture. It has been confirmed that temperature of 1200 °C is optimal to practice the process. Authors have demonstrated that condensed products after plasma treatment of water-salt-organic mixture contains targeted products (uranium and plutonium oxides) and gaseous products are environmental friendly. In conclusion basic operational modes for practicing the process are showed.

Si-compatible cleaning process for graphene using low-density inductively coupled plasma.

PubMed

Lim, Yeong-Dae; Lee, Dae-Yeong; Shen, Tian-Zi; Ra, Chang-Ho; Choi, Jae-Young; Yoo, Won Jong

2012-05-22

We report a novel cleaning technique for few-layer graphene (FLG) by using inductively coupled plasma (ICP) of Ar with an extremely low plasma density of 3.5 × 10(8) cm(-3). It is known that conventional capacitively coupled plasma (CCP) treatments destroy the planar symmetry of FLG, giving rise to the generation of defects. However, ICP treatment with extremely low plasma density is able to remove polymer resist residues from FLG within 3 min at a room temperature of 300 K while retaining the carbon sp(2)-bonding of FLG. It is found that the carrier mobility and charge neutrality point of FLG are restored to their pristine defect-free state after the ICP treatment. Considering the application of graphene to silicon-based electronic devices, such a cleaning method can replace thermal vacuum annealing, electrical current annealing, and wet-chemical treatment due to its advantages of being a low-temperature, large-area, high-throughput, and Si-compatible process.

Non-thermal equilibrium plasma-liquid interactions with femtolitre droplets

NASA Astrophysics Data System (ADS)

Maguire, Paul; Mahony, Charles; Bingham, Andrew; Patel, Jenish; Rutherford, David; McDowell, David; Mariotti, Davide; Bennet, Euan; Potts, Hugh; Diver, Declan

2014-10-01

Plasma-induced non-equilibrium liquid chemistry is little understood. It depends on a complex interplay of interface and near surface processes, many involving energy-dependent electron-induced reactions and the transport of transient species such as hydrated electrons. Femtolitre liquid droplets, with an ultra-high ratio of surface area to volume, were transported through a low-temperature atmospheric pressure RF microplasma with transit times of 1--10 ms. Under a range of plasma operating conditions, we observe a number of non-equilibrium chemical processes that are dominated by energetic electron bombardment. Gas temperature and plasma parameters (ne ~ 1013 cm-3, Te < 4 eV) were determined while size and droplet velocity profiles were obtained using a microscope coupled to a fast ICCD camera under low light conditions. Laminar mixed-phase droplet flow is achieved and the plasma is seen to significantly deplete only the slower, smaller droplet component due possibly to the interplay between evaporation, Rayleigh instabilities and charge emission. Funding from EPSRC acknowledged (Grants EP/K006088/1 and EP/K006142/1).

Plasma processing of superconducting radio frequency cavities

NASA Astrophysics Data System (ADS)

Upadhyay, Janardan

The development of plasma processing technology of superconducting radio frequency (SRF) cavities not only provides a chemical free and less expensive processing method, but also opens up the possibility for controlled modification of the inner surfaces of the cavity for better superconducting properties. The research was focused on the transition of plasma etching from two dimensional flat surfaces to inner surfaces of three dimensional (3D) structures. The results could be applicable to a variety of inner surfaces of 3D structures other than SRF cavities. Understanding the Ar/Cl2 plasma etching mechanism is crucial for achieving the desired modification of Nb SRF cavities. In the process of developing plasma etching technology, an apparatus was built and a method was developed to plasma etch a single cell Pill Box cavity. The plasma characterization was done with the help of optical emission spectroscopy. The Nb etch rate at various points of this cavity was measured before processing the SRF cavity. Cylindrical ring-type samples of Nb placed on the inner surface of the outer wall were used to measure the dependence of the process parameters on plasma etching. The measured etch rate dependence on the pressure, rf power, dc bias, temperature, Cl2 concentration and diameter of the inner electrode was determined. The etch rate mechanism was studied by varying the temperature of the outer wall, the dc bias on the inner electrode and gas conditions. In a coaxial plasma reactor, uniform plasma etching along the cylindrical structure is a challenging task due to depletion of the active radicals along the gas flow direction. The dependence of etch rate uniformity along the cylindrical axis was determined as a function of process parameters. The formation of dc self-biases due to surface area asymmetry in this type of plasma and its variation on the pressure, rf power and gas composition was measured. Enhancing the surface area of the inner electrode to reduce the asymmetry was studied by changing the contour of the inner electrode. The optimized contour of the electrode based on these measurements was chosen for SRF cavity processing.

Detection Of Gas-Phase Polymerization in SiH4 And GeH4

NASA Technical Reports Server (NTRS)

Shing, Yuh-Han; Perry, Joseph W.; Allevato, Camillo E.

1990-01-01

Inelastic scattering of laser light found to indicate onset of gas-phase polymerization in plasma-enhanced chemical-vapor deposition (PECVD) of photoconductive amorphous hydrogenated silicon/germanium alloy (a-SiGe:H) film. In PECVD process, film deposited from radio-frequency glow-discharge plasma of silane (SiH4) and germane (GeH4) diluted with hydrogen. Gas-phase polymerization undesirable because it causes formation of particulates and defective films.

Time-resolved resonance fluorescence spectroscopy for study of chemical reactions in laser-induced plasmas.

PubMed

Liu, Lei; Deng, Leimin; Fan, Lisha; Huang, Xi; Lu, Yao; Shen, Xiaokang; Jiang, Lan; Silvain, Jean-François; Lu, Yongfeng

2017-10-30

Identification of chemical intermediates and study of chemical reaction pathways and mechanisms in laser-induced plasmas are important for laser-ablated applications. Laser-induced breakdown spectroscopy (LIBS), as a promising spectroscopic technique, is efficient for elemental analyses but can only provide limited information about chemical products in laser-induced plasmas. In this work, time-resolved resonance fluorescence spectroscopy was studied as a promising tool for the study of chemical reactions in laser-induced plasmas. Resonance fluorescence excitation of diatomic aluminum monoxide (AlO) and triatomic dialuminum monoxide (Al 2 O) was used to identify these chemical intermediates. Time-resolved fluorescence spectra of AlO and Al 2 O were used to observe the temporal evolution in laser-induced Al plasmas and to study their formation in the Al-O 2 chemistry in air.

Investigations into the structure of PEO-layers for understanding of layer formation

NASA Astrophysics Data System (ADS)

Friedemann, A. E. R.; Thiel, K.; Haßlinger, U.; Ritter, M.; Gesing, Th. M.; Plagemann, P.

2018-06-01

Plasma electrolytic oxidation (PEO) is a type of high-voltage anodic oxidation process capable of producing a thick oxide layer with a wide variety of structural and chemical properties influenced by the electrolytic system. This process enables the combined adjustment of various characteristics, i.e. the morphology and chemical composition. The procedure facilitates the possibility of generating an individual structure as well as forming a crystalline surface in a single step. A highly porous surface with a high crystalline content consisting of titanium dioxide phases is ensured through the process of plasma electrolytic oxidizing pure titanium. In the present study plasma electrolytic oxidized TiO2-layers were investigated regarding their crystallinity through the layer thickness. The layers were prepared with a high applied voltage of 280 V to obtain a PEO-layer with highly crystalline anatase and rutile amounts. Raman spectroscopy and electron backscatter diffraction (EBSD) were selected to clarify the structure of the oxide layer with regard to its crystallinity and phase composition. The composition of the TiO2-phases is more or less irregularly distributed as a result of the higher energy input on the uppermost side of the layer. Scanning transmission electron microscopy (STEM) provided a deeper understanding of the structure and the effects of plasma discharges on the layer. It was observed that the plasma discharges have a strong influence on crystallite formation on top of the oxide layer and also at the boundary layer to the titanium substrate. Therefore, small crystallites of TiO2 could be detected in these regions. In addition, it was shown that amorphous TiO2 phases are formed around the characteristic pore structures, which allows the conclusion to be drawn that a rapid cooling from the gas phase had to take place in these areas.

Nitrogen Fixation by Gliding Arc Plasma: Better Insight by Chemical Kinetics Modelling.

PubMed

Wang, Weizong; Patil, Bhaskar; Heijkers, Stjin; Hessel, Volker; Bogaerts, Annemie

2017-05-22

The conversion of atmospheric nitrogen into valuable compounds, that is, so-called nitrogen fixation, is gaining increased interest, owing to the essential role in the nitrogen cycle of the biosphere. Plasma technology, and more specifically gliding arc plasma, has great potential in this area, but little is known about the underlying mechanisms. Therefore, we developed a detailed chemical kinetics model for a pulsed-power gliding-arc reactor operating at atmospheric pressure for nitrogen oxide synthesis. Experiments are performed to validate the model and reasonable agreement is reached between the calculated and measured NO and NO 2 yields and the corresponding energy efficiency for NO x formation for different N 2 /O 2 ratios, indicating that the model can provide a realistic picture of the plasma chemistry. Therefore, we can use the model to investigate the reaction pathways for the formation and loss of NO x . The results indicate that vibrational excitation of N 2 in the gliding arc contributes significantly to activating the N 2 molecules, and leads to an energy efficient way of NO x production, compared to the thermal process. Based on the underlying chemistry, the model allows us to propose solutions on how to further improve the NO x formation by gliding arc technology. Although the energy efficiency of the gliding-arc-based nitrogen fixation process at the present stage is not comparable to the world-scale Haber-Bosch process, we believe our study helps us to come up with more realistic scenarios of entering a cutting-edge innovation in new business cases for the decentralised production of fertilisers for agriculture, in which low-temperature plasma technology might play an important role. © 2017 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

An Alternative to Annealing TiO2 Nanotubes for Morphology Preservation: Atmospheric Pressure Plasma Jet Treatment.

PubMed

Seo, Sang-Hee; Uhm, Soo-Hyuk; Kwon, Jae-Sung; Choi, Eun Ha; Kim, Kwang-Mahn; Kim, Kyoung-Nam

2015-03-01

Titanium oxide nanotube layer formed by plasma electrolytic oxidation (PEO) is known to be excellent in biomaterial applications. However, the annealing process which is commonly performed on the TiO2 nanotubes cause defects in the nanotubular structure. The purpose of this work was to apply a non-thermal atmospheric pressure plasma jet on diameter-controlled TiO2 nanotubes to mimic the effects of annealing while maintaining the tubular structure for use as biomaterial. Diameter-controlled nanotube samples fabricated by plasma electrolytic oxidation were dried and prepared under three different conditions: untreated, annealed at 450 °C for 1 h in air with a heating rate of 10 °C/min, and treated with an air-based non-thermal atmospheric pressure plasma jet for 5 minutes. The contact angle measurement was investigated to confirm the enhanced hydrophilicity of the TiO2 nanotubes. The chemical composition of the surface was studied using X-ray photoelectron spectroscopy, and the morphology of TiO2 nanotubes was examined by field emission scanning electron microscopy. For the viability of the cell, the attachment of the osteoblastic cell line MC3T3-E1 was determined using the water-soluble tetrazolium salt assay. We found that there are no morphological changes in the TiO2 nanotubular structure after the plasma treatment. Also, we investigated a change in the chemical composition and enhanced hydrophilicity which result in improved cell behavior. The results of this study indicated that the non-thermal atmospheric pressure plasma jet results in osteoblast functionality that is comparable to annealed samples while maintaining the tubular structure of the TiO2 nanotubes. Therefore, this study concluded that the use of a non-thermal atmospheric pressure plasma jet on nanotube surfaces may replace the annealing process following plasma electrolytic oxidation.

Receptor-mediated endocytosis generates nanomechanical force reflective of ligand identity and cellular property.

PubMed

Zhang, Xiao; Ren, Juan; Wang, Jingren; Li, Shixie; Zou, Qingze; Gao, Nan

2018-08-01

Whether environmental (thermal, chemical, and nutrient) signals generate quantifiable, nanoscale, mechanophysical changes in the cellular plasma membrane has not been well elucidated. Assessment of such mechanophysical properties of plasma membrane may shed lights on fundamental cellular process. Atomic force microscopic (AFM) measurement of the mechanical properties of live cells was hampered by the difficulty in accounting for the effects of the cantilever motion and the associated hydrodynamic force on the mechanical measurement. These challenges have been addressed in our recently developed control-based AFM nanomechanical measurement protocol, which enables a fast, noninvasive, broadband measurement of the real-time changes in plasma membrane elasticity in live cells. Here we show using this newly developed AFM platform that the plasma membrane of live mammalian cells exhibits a constant and quantifiable nanomechanical property, the membrane elasticity. This mechanical property sensitively changes in response to environmental factors, such as the thermal, chemical, and growth factor stimuli. We demonstrate that different chemical inhibitors of endocytosis elicit distinct changes in plasma membrane elastic modulus reflecting their specific molecular actions on the lipid configuration or the endocytic machinery. Interestingly, two different growth factors, EGF and Wnt3a, elicited distinct elastic force profiles revealed by AFM at the plasma membrane during receptor-mediated endocytosis. By applying this platform to genetically modified cells, we uncovered a previously unknown contribution of Cdc42, a key component of the cellular trafficking network, to EGF-stimulated endocytosis at plasma membrane. Together, this nanomechanical AFM study establishes an important foundation that is expandable and adaptable for investigation of cellular membrane evolution in response to various key extracellular signals. © 2017 Wiley Periodicals, Inc.

Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

NASA Astrophysics Data System (ADS)

Vadym, Prysiazhnyi; Pavel, Slavicek; Eliska, Mikmekova; Milos, Klima

2016-04-01

This paper is aimed to show the influence of initial chemical pretreatment prior to subsequent plasma activation of aluminum surfaces. The results of our study showed that the state of the topmost surface layer (i.e. the surface morphology and chemical groups) of plasma modified aluminum significantly depends on the chemical precleaning. Commonly used chemicals (isopropanol, trichlorethane, solution of NaOH in deionized water) were used as precleaning agents. The plasma treatments were done using a radio frequency driven atmospheric pressure plasma pencil developed at Masaryk University, which operates in Ar, Ar/O2 gas mixtures. The effectiveness of the plasma treatment was estimated by the wettability measurements, showing high wettability improvement already after 0.3 s treatment. The effects of surface cleaning (hydrocarbon removal), surface oxidation and activation (generation of OH groups) were estimated using infrared spectroscopy. The changes in the surface morphology were measured using scanning electron microscopy. Optical emission spectroscopy measurements in the near-to-surface region with temperature calculations showed that plasma itself depends on the sample precleaning procedure.

A Self Consistent RF Discharge, Plasma Chemistry and Surface Model for Plasma Enhanced Chemical Vapor Deposition

DTIC Science & Technology

1988-06-30

consists of three submodels for the electron kinetics, plasma chemistry , and surface deposition kinetics for a-Si:H deposited from radio frequency...properties. Plasma enhanced, Chemical vapor deposition, amorphous silicon, Modeling, Electron kinetics, Plasma chemistry , Deposition kinetics, Rf discharge, Silane, Film properties, Silicon.

Plasma impregnation of wood with fire retardants

NASA Astrophysics Data System (ADS)

Pabeliña, Karel G.; Lumban, Carmencita O.; Ramos, Henry J.

2012-02-01

The efficacy of chemical and plasma treatments with phosphate and boric compounds, and nitrogen as flame retardants on wood are compared in this study. The chemical treatment involved the conventional method of spraying the solution over the wood surface at atmospheric condition and chemical vapor deposition in a vacuum chamber. The plasma treatment utilized a dielectric barrier discharge ionizing and decomposing the flame retardants into innocuous simple compounds. Wood samples are immersed in either phosphoric acid, boric acid, hydrogen or nitrogen plasmas or a plasma admixture of two or three compounds at various concentrations and impregnated by the ionized chemical reactants. Chemical changes on the wood samples were analyzed by Fourier transform infrared spectroscopy (FTIR) while the thermal changes through thermo gravimetric analysis (TGA). Plasma-treated samples exhibit superior thermal stability and fire retardant properties in terms of highest onset temperature, temperature of maximum pyrolysis, highest residual char percentage and comparably low total percentage weight loss.

Examination of the physical processes associated with the keyhole region of variable polarity plasma arc welds in aluminum alloy 2219

NASA Technical Reports Server (NTRS)

Walsh, Daniel W.

1987-01-01

The morphology and properties of the Variable Polarity Plasma Arc (VPPA) weld composite zone are intimately related to the physical processes associated with the keyhole. This study examined the effects of oxide, halide, and sulfate additions to the weld plate on the keyhole and the weld pool. Changes in both the arc plasma character and the bead morphology were correlated to the chemical environment of the weld. Pool behavior was observed by adding flow markers to actual VPPA welds. A low temperature analog to the welding process was developed. The results of the study indicate that oxygen, even at low partial pressures, can disrupt the stable keyhole and weld pool. The results also indicate that the Marangoni surface tension driven flows dominate the weld pool over the range of welding currents studied.

An ecotoxic risk assessment of residue materials produced by the plasma pyrolysis/vitrification (PP/V) process.

PubMed

Lapa, N; Santos, Oliveira J F; Camacho, S L; Circeo, L J

2002-01-01

Plasma is the fourth state of matter, following the three states of solid, liquid and gas. Experience has amply demonstrated that solids exposed to the oxygen-deficient plasma flame are converted to liquid, and liquid exposed to the same flame is converted to gas. A low amount of vitrified solid residue material usually remains at the end of this process. Plasma pyrolysis/vitrification (PP/V) has been demonstrated as a safe, efficient, cost-effective technology for the treatment of wastes, including hazardous wastes. Besides the low amounts of gaseous byproducts that PP/V produces, the solid vitrified residue presents a low leachability of pollutants. Studies have been performed in many countries in order to assess the leachability of chemical substances. But from the results of identified studies, none has reported results on the ecotoxicological properties of the leachates. The aim of this study was to contribute to the assessment of ecotoxic risk of four different vitrified materials. Vitrified samples of contaminated soils, municipal solid wastes, and incinerator bottom ashes were submitted to the European leaching pre-standard test number prEN 12457-2. The leachates were analyzed for 22 chemical parameters. The biological characterization comprised the assessment of bioluminescence inhibition of Photobacterium phosphoreum bacterium, growth inhibition of Pseudokirchneriella subcapitata algae and the germination inhibition of Lactuca sativa vegetable. The chemical and ecotoxicological results were analyzed according to the French proposal of Criteria on the Evaluation Methods of Waste Toxicity (CEMWT) and a Toxicity Classification System (TCS). The chemical and ecotoxicological results indicated a low leachability of pollutants and a low toxicity level of leachates. All samples studied were as below the TCS class 1 level (no significant toxicity observed) and as non-ecotoxic for CEMWT. Therefore, the environmental ecotoxic risk of the analyzed vitrified samples was determined to be very low.

Plasma Radiofrequency Discharges as Cleaning Technique for the Removal of C-W Coatings

NASA Astrophysics Data System (ADS)

Cremona, A.; Vassallo, E.; Caniello, R.; Ghezzi, F.; Grosso, G.; Laguardia, L.

2013-06-01

Erosion of materials by chemical and physical sputtering is one of the most concern of plasma wall interaction in tokamaks. In divertor ITER-like tokamaks, where carbon and tungsten are planned to be used, hydrogenated C-W mixed compounds are expected to form by erosion, transport and re-deposition processes. The selection of these materials as divertor components involves lifetime and safety issues due to tritium retention in carbon co-deposits. In this paper a cleaning technique based on RF (13.56 MHz) capacitively coupled H2/Ar plasmas has been used to remove C-W mixed materials from test specimens. The dependence of the removal rate on the H2/Ar ratio and on the plasma pressure has been investigated by X-ray photoelectron spectroscopy, atomic force microscopy, profilometry as regards the solid phase and by Langmuir probe and optical emission spectroscopy as regards the plasma phase. The best result has been obtained with a H2/Ar ratio of 10/90 at a pressure of 1 Pa. An explanation based on a synergistic effect between physical sputtering due to energetic ions and chemical etching due to radicals, together with the pressure dependence of the ion energy distribution function, is given.

Spectroscopic studies of MW plasmas containing HMDSO, O2 and N2

NASA Astrophysics Data System (ADS)

Nave, Andy; Roepcke, Juergen; Mitschker, Felix; Awakowicz, Peter

2015-09-01

The deposition of SiOx layers based on organosilicon plasmas is used to implement advantageous mechanical, electrical, and/or optical properties on various substrates. The development of such coating processes resulting in a wide range of chemical and physical film properties, using hexamethyldisiloxane (HMDSO) as a precursor, has been in the center of interest of various studies. In plasma, the dissociation of HMDSO into a large amount of fragments is a complex chemical phenomenon. The monitoring of the precursor and of formed species is very valuable to understand the plasma chemistry. Infrared absorption spectroscopy based on lead salt lasers and EC Quantum Cascade Laser have been used to monitor the concentrations of HMDSO, and of the reaction products CH4, C2H2, C2H4,C2H6, CO, CO2 and CH3 as a function of the HMDSO/O2 mixture ratio, and the power at various pressures in a MW plasma deposition reactor. Optical emission spectroscopy has been applied as complementary diagnostics to evaluate electron density and electron temperature. Supported by the German Research Foundation within SFB-TR24 and SFB-TR87.

Plasma-chemical simulation of negative corona near the inception voltage

NASA Astrophysics Data System (ADS)

Pontiga, Francisco; Duran-Olivencia, Francisco J.; Castellanos, Antonio

2013-09-01

The spatiotemporal development of Trichel pulses in oxygen between a spherical electrode and a grounded plane has been simulated using a fluid approximation that incorporates the plasma chemistry of the electrical discharge. Elementary plasma processes, such as ionization, electron attachment, electron detachment, recombination between ions and chemical reactions between neutral species, are all included in a chemical model consisting of 55 reactions between 8 different species (electrons, O2+,O2-,O3-,O-, O2, O, O3). Secondary emission at the cathode by the impact of positive ions and photons is also considered. The spatial distribution of species is computed in three dimensions (2D-axysimmetrical) by solving Poisson's equation for the electric field and the continuity equations for the species, with the inclusion of the chemical gain/loss rate due to the particle interaction. The results of the simulation reveal the interplay between the different negative ions during the development of every Trichel pulse, and the rate of production of atomic oxygen and ozone by the corona discharge. This work was supported by the Consejeria de Innovacion, Ciencia y Empresa (Junta de Andalucia) and by the Ministerio de Ciencia e Innovacion, Spain, within the European Regional Development Fund contracts FQM-4983 and FIS2011-25161.

Process for the synthesis of nanophase dispersion-strengthened aluminum alloy

DOEpatents

Barbour, John C.; Knapp, James Arthur; Follstaedt, David Martin; Myers, Samuel Maxwell

1998-12-15

A process for fabricating dispersion-strengthened ceramic-metal composites is claimed. The process comprises in-situ interaction and chemical reaction of a metal in gaseous form with a ceramic producer in plasma form. Such composites can be fabricated with macroscopic dimensions. Special emphasis is placed on fabrication of dispersion-strengthened aluminum oxide-aluminum composites, which can exhibit flow stresses more characteristic of high strength steel.

Characteristics of epoxy resin/SiO2 nanocomposite insulation: effects of plasma surface treatment on the nanoparticles.

PubMed

Yan, Wei; Phung, B T; Han, Zhao Jun; Ostrikov, Kostya

2013-05-01

The present study compares the effects of two different material processing techniques on modifying hydrophilic SiO2 nanoparticles. In one method, the nanoparticles undergo plasma treatment by using a custom-developed atmospheric-pressure non-equilibrium plasma reactor. With the other method, they undergo chemical treatment which grafts silane groups onto their surface and turns them into hydrophobic. The treated nanoparticles are then used to synthesize epoxy resin-based nanocomposites for electrical insulation applications. Their characteristics are investigated and compared with the pure epoxy resin and nanocomposite fabricated with unmodified nanofillers counterparts. The dispersion features of the nanoparticles in the epoxy resin matrix are examined through scanning electron microscopy (SEM) images. All samples show evidence that the agglomerations are smaller than 30 nm in their diameters. This indicates good dispersion uniformity. The Weibull plot of breakdown strength and the recorded partial discharge (PD) events of the epoxy resin/plasma-treated hydrophilic SiO2 nanocomposite (ER/PTI) suggest that the plasma-treated specimen yields higher breakdown strength and lower PD magnitude as compared to the untreated ones. In contrast, surprisingly, lower breakdown strength is found for the nanocomposite made by the chemically treated hydrophobic particles, whereas the PD magnitude and PD numbers remain at a similar level as the plasma-treated ones.

Chemical vapour deposition growth and Raman characterization of graphene layers and carbon nanotubes

NASA Astrophysics Data System (ADS)

Lai, Y.-C.; Rafailov, P. M.; Vlaikova, E.; Marinova, V.; Lin, S. H.; Yu, P.; Yu, S.-C.; Chi, G. C.; Dimitrov, D.; Sveshtarov, P.; Mehandjiev, V.; Gospodinov, M. M.

2016-02-01

Single-layer graphene films were grown by chemical vapour deposition (CVD) on Cu foil. The CVD process was complemented by plasma enhancement to grow also vertically aligned multiwalled carbon nanotubes using Ni nanoparticles as catalyst. The obtained samples were characterized by Raman spectroscopy analysis. Nature of defects in the samples and optimal growth conditions leading to achieve high quality of graphene and carbon nanotubes are discussed.

Lithium-ions diffusion kinetic in LiFePO4/carbon nanoparticles synthesized by microwave plasma chemical vapor deposition for lithium-ion batteries

NASA Astrophysics Data System (ADS)

Gao, Chao; Zhou, Jian; Liu, Guizhen; Wang, Lin

2018-03-01

Olivine structure LiFePO4/carbon nanoparticles are synthesized successfully using a microwave plasma chemical vapor deposition (MPCVD) method. Microwave is an effective method to synthesize nanomaterials, the LiFePO4/carbon nanoparticles with high crystallinity can shorten diffusion routes for ionic transfer and electron tunneling. Meanwhile, a high quality, complete and homogenous carbon layer with appropriate thickness coating on the surface of LiFePO4 particles during in situ chemical vapor deposition process, which can ensure that electrons are able to transfer fast enough from all sides. Electrochemical impedance spectroscopy (EIS) is carried out to collect information about the kinetic behavior of lithium diffusion in LiFePO4/carbon nanoparticles during the charging and discharging processes. The chemical diffusion coefficients of lithium ions, DLi, are calculated in the range of 10-15-10-9 cm2s-1. Nanoscale LiFePO4/carbon particles show the longer regions of the faster solid-solution diffusion, and corresponding to the narrower region of the slower two-phase diffusion during the insertion/exaction of lithium ions. The CV and galvanostatic charge-discharge measurements show that the LiFePO4/carbon nanoparticles perform an excellent electrochemical performance, especially the high rate capacity and cycle life.

Silicon Cluster Tool | Photovoltaic Research | NREL

Science.gov Websites

Material Deposition/Device Fabrication Very-high-frequency plasma-enhanced chemical vapor deposition (VHF PECVD) for microcrystalline silicon (µc-Si:H) Combinatorial plasma-enhanced chemical vapor deposition (Combi-PECVD) for p-type a-Si:H Plasma-enhanced chemical vapor deposition (PECVD) for n-type a-Si:H

Efficiency of a hybrid-type plasma-assisted fuel reformation system

DOE Office of Scientific and Technical Information (OSTI.GOV)

Matveev, I.B.; Serbin, S.I.; Lux, S.M.

2008-12-15

The major advantages of a new plasma-assisted fuel reformation system are its cost effectiveness and technical efficiency. Applied Plasma Technologies has proposed its new highly efficient hybrid-type plasma-assisted system for organic fuel combustion and gasification. The system operates as a multimode multipurpose reactor in a wide range of plasma feedstock gases and turndown ratios. This system also has convenient and simultaneous feeding of several reagents in the reaction zone such as liquid fuels, coal, steam, and air. A special methodology has been developed for such a system in terms of heat balance evaluation and optimization. This methodology considers all existingmore » and possible energy streams, which could influence the system's efficiency. The developed hybrid-type plasma system could be suitable for combustion applications, mobile and autonomous small- to mid-size liquid fuel and coal gasification modules, hydrogen-rich gas generators, waste-processing facilities, and plasma chemical reactors.« less

Antimicrobial Applications of Ambient--Air Plasmas

NASA Astrophysics Data System (ADS)

Pavlovich, Matthew John

The emerging field of plasma biotechology studies the applications of the plasma phase of matter to biological systems. "Ambient-condition" plasmas created at or near room temperature and atmospheric pressure are especially promising for biomedical applications because of their convenience, safety to patients, and compatibility with existing medical technology. Plasmas can be created from many different gases; plasma made from air contains a number of reactive oxygen and nitrogen species, or RONS, involved in various biological processes, including immune activity, signaling, and gene expression. Therefore, ambient-condition air plasma is of particular interest for biological applications. To understand and predict the effects of treating biological systems with ambient-air plasma, it is necessary to characterize and measure the chemical species that these plasmas produce. Understanding both gaseous chemistry and the chemistry in plasma-treated aqueous solution is important because many biological systems exist in aqueous media. Existing literature about ambient-air plasma hypothesizes the critical role of reactive oxygen and nitrogen species; a major aim of this dissertation is to better quantify RONS by produced ambient-air plasma and understand how RONS chemistry changes in response to different plasma processing conditions. Measurements imply that both gaseous and aqueous chemistry are highly sensitive to operating conditions. In particular, chemical species in air treated by plasma exist in either a low-power ozone-dominated mode or a high-power nitrogen oxide-dominated mode, with an unstable transition region at intermediate discharge power and treatment time. Ozone (O3) and nitrogen oxides (NO and NO2, or NOx) are mutually exclusive in this system and that the transition region corresponds to the transition from ozone- to nitrogen oxides-mode. Aqueous chemistry agrees well with to air plasma chemistry, and a similar transition in liquid-phase composition from ozone mode to nitrogen oxides mode occurs as the discharge power increases. One prominent example of plasma biotechnology is the use of plasma-derived reactive species as a novel disinfectant. Ambient-air plasma is an attractive means of disinfection because it is non-thermal, expends a small amount of power, and requires only air and electricity to operate. Both solid surfaces and liquid volumes can be effectively and efficiently decontaminated by the reactive oxygen and nitrogen species that plasma generates. Dry surfaces are decontaminated most effectively by the plasma operating in NOx mode and less effectively in ozone mode, with the weakest antibacterial effects in the transition region, and neutral reactive species are more influential in surface disinfection than charged particles. Aqueous bacterial inactivation correlates well with ozone concentration, suggesting that ozone is the dominant species for bacterial inactivation under the condition of a low-power discharge. Alternatively, air plasma operating in the higher-power, nitrogen oxides-rich mode can create a persistently antibacterial solution. Finally, when near-UV (UVA) treatment follows plasma treatment of bacterial suspension, the antimicrobial effect exceeds the effect predicted from the two treatments alone, and addition of nitrite to aqueous solution, followed by photolysis of nitrite by UVA photons, is hypothesized as the primary mechanism of synergy. The results presented in this dissertation underscore the dynamic nature of air plasma chemistry and the importance of careful chemical characterization of plasma devices intended for biological applications. The complexity of atmospheric pressure plasma devices, and their sensitivity to subtle differences in design and operation, can lead to different results with different mechanisms.

Characterization of Carbon-Contaminated B4C-Coated Optics after Chemically Selective Cleaning with Low-Pressure RF Plasma.

PubMed

Moreno Fernández, H; Rogler, D; Sauthier, G; Thomasset, M; Dietsch, R; Carlino, V; Pellegrin, E

2018-01-22

Boron carbide (B 4 C) is one of the few materials that is expected to be most resilient with respect to the extremely high brilliance of the photon beam generated by free electron lasers (FELs) and is thus of considerable interest for optical applications in this field. However, as in the case of many other optics operated at light source facilities, B 4 C-coated optics are subject to ubiquitous carbon contaminations. Carbon contaminations represent a serious issue for the operation of FEL beamlines due to severe reduction of photon flux, beam coherence, creation of destructive interference, and scattering losses. A variety of B 4 C cleaning technologies were developed at different laboratories with varying success. We present a study regarding the low-pressure RF plasma cleaning of carbon contaminated B 4 C test samples via inductively coupled O 2 /Ar, H 2 /Ar, and pure O 2 RF plasma produced following previous studies using the same ibss GV10x downstream plasma source. Results regarding the chemistry, morphology as well as other aspects of the B 4 C optical coating before and after the plasma cleaning are reported. We conclude that among the above plasma processes only plasma based on pure O 2 feedstock gas exhibits the required chemical selectivity for maintaining the integrity of the B 4 C optical coatings.

The value of swarm data for practical modeling of plasma devices

NASA Astrophysics Data System (ADS)

Napartovich, A. P.; Kochetov, I. V.

2011-04-01

The non-thermal plasma is a key component in gas lasers, waste gas cleaners, ozone generators, plasma igniters, flame holders, flow control in high-speed aerodynamics and other applications. The specific feature of the non-thermal plasma is its high sensitivity to variations in governing parameters (gas composition, pressure, pulse duration, E/N parameter). The reactivity of the plasma is due to the appearance of atoms and chemical radicals. For the efficient production of chemically active species high average electron energy is required, which is controlled by the balance of gain from the electric field and loss in inelastic collisions. In low-ionized plasma the electron energy distribution function is far from Maxwellian and must be found numerically for specified conditions. Numerical modeling of processes in plasma technologies requires vast databases on electron scattering cross sections to be available. The only reliable criterion for evaluations of validity of a set of cross sections for a particular species is a correct prediction of electron transport and kinetic coefficients measured in swarm experiments. This criterion is used traditionally to improve experimentally measured cross sections, as was suggested earlier by Phelps. The set of cross sections subjected to this procedure is called a self-consistent set. Nowadays, such reliable self-consistent sets are known for many species. Problems encountered in implementation of the fitting procedure and examples of its successful applications are described in the paper. .

NiTi shape-memory alloy oxidized in low-temperature plasma with carbon coating: Characteristic and a potential for cardiovascular applications

NASA Astrophysics Data System (ADS)

Witkowska, Justyna; Sowińska, Agnieszka; Czarnowska, Elżbieta; Płociński, Tomasz; Borowski, Tomasz; Wierzchoń, Tadeusz

2017-11-01

Surface layers currently produced on NiTi alloys do not meet all the requirements for materials intended for use in cardiology. Plasma surface treatments of titanium and its alloys under glow discharge conditions make it possible to produce surface layers, such as TiN or TiO2, which increases corrosion resistance and biocompatibility. The production of layers on NiTi alloys with the same properties, and maintaining their shape memory and superelasticity features, requires the use of low-temperature processes. At the same time, since it is known that the carbon-based layers could prevent excessive adhesion and aggregation of platelets, we examined the composite a-CNH + TiO2 type surface layer produced by means of a hybrid method combining oxidation in low-temperature plasma and Radio Frequency Chemical Vapor Deposition (RFCVD) processes. Investigations have shown that this composite layer increases the corrosion resistance of the material, and both the low degree of roughness and the chemical composition of the surface produced lead to decreased platelet adhesion and aggregation and proper endothelialization, which could extend the range of applications of NiTi shape memory alloys.

Barrier SiO2-like coatings for archaeological artefacts preservation

NASA Astrophysics Data System (ADS)

Prochazka, M.; Blahova, L.; Krcma, F.

2016-10-01

Thin film chemical vapour deposition technique has been used for more than 50 years. Introducing organo-silicones as precursors, e.g. hexamethyldisiloxane (HMDSO) or tetraethyl orthosilicate (TEOS), brought new possibilities to this method. Barrier properties of thin films have become an important issue, especially for army and emergency services as well as for food and drink manufacturers. Our work is focused on protective HMDSO thin films for encapsulating cleaned archaeological artefacts, preventing the corrosion from destroying these historical items.Thin films are deposited via plasma enhanced chemical vapour deposition (PECVD) technique using low pressure capacitively coupled pasma in flow regime. Oxygen transmission rate (OTR) measurement was chosen as the most important one for characterization of barrier properties of deposited thin films. Lowest OTR reached for 50 nm thin film thickness was 120 cm3 m-2 atm-1 day-1. Samples were also analyzed by Fourier Transform Infrared spectrometry (FTIR) to determine their composition. Optical emission spectra and thin film thickness were measured during the deposition process. We optimized the deposition parameters for barrier layers by implementation of pulsed mode of plasma and argon plasma pre-treatment into the process.

Physical conditions and chemical processes during single-bubble sonoluminescence

NASA Astrophysics Data System (ADS)

Flannigan, David J.

In order to gain insight into the physical conditions and chemical processes associated with single-bubble sonoluminescence (SBSL), nonvolatile liquids such as concentrated sulfuric acid (H2SO 4) were explored. The SBSL radiant powers from H2SO 4 aqueous solutions were found to be over 103 times larger than those typically observed for SBSL from water. In addition, the emission spectra contain extensive bands and lines from molecules, atoms, and ions. The population of high-energy states of atoms (20 eV) and ions (37 eV) provides definitive experimental evidence of the formation of a plasma. By using various techniques (e.g., small molecules and atoms as intra-cavity probes, standard methods of plasma diagnostics, and spectrometric methods of pyrometry), it was possible to quantify the heavy particle temperatures (15,000 K), heavy particle densities (1021 cm-3) and pressures (4,000 bar), and plasma electron densities (1018 cm -3) generated during SBSL from H2SO4. It was also found that SBSL from H2SO4 containing mixtures of noble gas and air was quenched up to a critical acoustic pressure, above which the radiant powers increased by 104. From the spectral profiles it was determined that the air limited heating and plasma formation by endothermic chemical reactions and energy-transfer reactions. Simultaneous stroboscopic and spectroscopic studies of SBSL in H2SO4 containing alkali-metal sulfates showed that dramatic changes in the bubble dynamics correlated with the onset of emission from nonvolatile species such as Na and K atoms. These effects were attributed to the development of interfacial instabilities with increasing translational velocity of the bubble.

Diagnostic techniques in thermal plasma processing, part 2, volume 2

NASA Astrophysics Data System (ADS)

Boulos, M.; Fauchais, P.; Pfender, E.

1986-02-01

Techniques for diagnostics for thermal plasmas are discussed. These include both optical techniques and in-flight measurements of particulate matter. In the core of the plasma, collisional excitation of the various chemical species is so strong that the population of the corresponding quantum levels becomes high enough for net emission from the plasma. In that case, the classical methods of emission spectroscopy may be applied. But in the regions where the temperatures are below 4000K (these regions are of primary importance for plasma processing), the emission from the plasma is no longer sufficient for emission spectroscopy. In this situation, the population of excited levels must be increased by the absorption of the light from an external source. Such sources, as for example pulsed tunable dye lasers, are now commercially available. The use of such new devices leads to various techniques such as laser induced fluorescence (LIF) or Coherent Anti Stockes Raman Spectroscopy (CARS) that can be used for analyzing plasmas. Particle velocity measurements can be achieved by photography and laser Doppler anemometry. Particle flux measurements are typically achieved by collecting particles on a substrate. Particle size measurements are based on intensity of scattered light.

Using advanced oxidation treatment for biofilm inactivation by varying water vapor content in air plasma

NASA Astrophysics Data System (ADS)

Ryota, Suganuma; Koichi, Yasuoka

2015-09-01

Biofilms are caused by environmental degradation in food factories and medical facilities. The inactivation of biofilms involves making them react with chemicals including chlorine, hydrogen peroxide, and ozone, although inactivation using chemicals has a potential problem because of the hazardous properties of the residual substance and hydrogen peroxide, which have slow reaction velocity. We successfully performed an advanced oxidation process (AOP) using air plasma. Hydrogen peroxide and ozone, which were used for the formation of OH radicals in our experiment, were generated by varying the amount of water vapor supplied to the plasma. By varying the content of the water included in the air, the main product was changed from air plasma. When we increased the water content in the air, hydrogen peroxide was produced, while ozone peroxide was produced when we decreased the water content in the air. By varying the amount of water vapor, we realized a 99.9% reduction in the amount of bacteria in the biofilm when we discharged humidified air only. This work was supported by JSPS KAKENHI Grant Number 25630104.

The reactive bed plasma system for contamination control

NASA Technical Reports Server (NTRS)

Birmingham, Joseph G.; Moore, Robert R.; Perry, Tony R.

1990-01-01

The contamination control capabilities of the Reactive Bed Plasma (RBP) system is described by delineating the results of toxic chemical composition studies, aerosol filtration work, and other testing. The RBP system has demonstrated its capabilities to decompose toxic materials and process hazardous aerosols. The post-treatment requirements for the reaction products have possible solutions. Although additional work is required to meet NASA requirements, the RBP may be able to meet contamination control problems aboard the Space Station.

Photoresist removal using gaseous sulfur trioxide cleaning technology

NASA Astrophysics Data System (ADS)

Del Puppo, Helene; Bocian, Paul B.; Waleh, Ahmad

1999-06-01

A novel cleaning method for removing photoresists and organic polymers from semiconductor wafers is described. This non-plasma method uses anhydrous sulfur trioxide gas in a two-step process, during which, the substrate is first exposed to SO3 vapor at relatively low temperatures and then is rinsed with de-ionized water. The process is radically different from conventional plasma-ashing methods in that the photoresist is not etched or removed during the exposure to SO3. Rather, the removal of the modified photoresist takes place during the subsequent DI-water rinse step. The SO3 process completely removes photoresist and polymer residues in many post-etch applications. Additional advantages of the process are absence of halogen gases and elimination of the need for other solvents and wet chemicals. The process also enjoys a very low cost of ownership and has minimal environmental impact. The SEM and SIMS surface analysis results are presented to show the effectiveness of gaseous SO3 process after polysilicon, metal an oxide etch applications. The effects of both chlorine- and fluorine-based plasma chemistries on resist removal are described.

Experimental and computational study of dielectric barrier discharges for environmental applications

NASA Astrophysics Data System (ADS)

Aerts, Robby

Air pollution has become a major global concern which affects all inhabitants of our precious earth. Nowadays it is fact that our climate is changing and the sea level is rising. Moreover, we are facing an energy crisis because all our fossil fuel resources will sooner or later be running empty. It is clear that drastic measures are needed to keep our planet as it is today for generations to come. One of these measures is the 20-20-20 targets imposed by the European Commission, which stimulates the research for environmental energy applications. In this PhD dissertation two environmental applications of plasma technology are investigated. The first one is the abatement of flue gases, and more specifically the destruction of volatile organic compounds (VOCs). The second one is the conversion of CO2 into valuable chemicals. Both of these applications suffer from a large energy cost under classical (thermodynamic) conditions, due to the chemical stability of these molecules. Plasma technology is quite promising to overcome these thermodynamic barriers. Plasmas allow reactions at different time-scales with different species, such as electrons, ions, radicals, molecules and excited species, creating new chemical pathways. Indeed, in a plasma the applied electrical energy is directly transferred to the electrons, which activate the gas by ionization, excitation and dissociation, hence creating reactive species (ions, excited species, radicals), that can further easily undergo other chemical reactions. Especially gas discharges, which are low temperature plasmas, show promising results in the destruction of pollutants at mild conditions. A common type of gas discharge is the dielectric barrier discharge (DBD) which has been successfully scaled up for industrial ozone generation and is widely investigated in the field of environmental applications. The complexity of DBDs creates difficulties for experimental diagnostics and therefore numerical studies can help to improve our understanding of the ongoing processes. A chemical kinetics model developed by M. Kushner and co-workers combined with experiments was used in this PhD dissertation to obtain insight in the ongoing plasma chemistry for the environmental applications discussed above.

Applications of plasma core reactors to terrestrial energy systems

NASA Technical Reports Server (NTRS)

Latham, T. S.; Biancardi, F. R.; Rodgers, R. J.

1974-01-01

Plasma core reactors offer several new options for future energy needs in addition to space power and propulsion applications. Power extraction from plasma core reactors with gaseous nuclear fuel allows operation at temperatures higher than conventional reactors. Highly efficient thermodynamic cycles and applications employing direct coupling of radiant energy are possible. Conceptual configurations of plasma core reactors for terrestrial applications are described. Closed-cycle gas turbines, MHD systems, photo- and thermo-chemical hydrogen production processes, and laser systems using plasma core reactors as prime energy sources are considered. Cycle efficiencies in the range of 50 to 65 percent are calculated for closed-cycle gas turbine and MHD electrical generators. Reactor advantages include continuous fuel reprocessing which limits inventory of radioactive by-products and thorium-U-233 breeder configurations with about 5-year doubling times.-

Etching and structure changes in PMMA coating under argon plasma immersion ion implantation

NASA Astrophysics Data System (ADS)

Kondyurin, Alexey; Bilek, Marcela

2011-06-01

A thin (120 nm) polymethylmethacrylate coating was treated by plasma immersion ion implantation with Ar using pulsed bias at 20 kV. Ellipsometry and FTIR spectroscopy and gel-fraction formation were used to detect the structure transformations as a function of ion fluence. The kinetics of etching, variations in refractive index and extinction coefficient in 400-1000 nm of wavelength, concentration changes in carbonyl, ether, methyl and methylene groups all as a function of ion fluence were analyzed. A critical ion fluence of 10 15 ions/cm 2 was observed to be a border between competing depolymerization and carbonization processes. Chemical reactions responsible for reorganization of the PMMA chemical structure under ion beam treatment are proposed.

TOPICAL REVIEW: Physics and phenomena in pulsed magnetrons: an overview

NASA Astrophysics Data System (ADS)

Bradley, J. W.; Welzel, T.

2009-05-01

This paper reviews the contribution made to the observation and understanding of the basic physical processes occurring in an important type of magnetized low-pressure plasma discharge, the pulsed magnetron. In industry, these plasma sources are operated typically in reactive mode where a cathode is sputtered in the presence of both chemically reactive and noble gases typically with the power modulated in the mid-frequency (5-350 kHz) range. In this review, we concentrate mostly, however, on physics-based studies carried out on magnetron systems operated in argon. This simplifies the physical-chemical processes occurring and makes interpretation of the observations somewhat easier. Since their first recorded use in 1993 there have been more than 300 peer-reviewed paper publications concerned with pulsed magnetrons, dealing wholly or in part with fundamental observations and basic studies. The fundamentals of these plasmas and the relationship between the plasma parameters and thin film quality regularly have whole sessions at international conferences devoted to them; however, since many different types of magnetron geometries have been used worldwide with different operating parameters the important results are often difficult to tease out. For example, we find the detailed observations of the plasma parameter (particle density and temperature) evolution from experiment to experiment are at best difficult to compare and at worst contradictory. We review in turn five major areas of studies which are addressed in the literature and try to draw out the major results. These areas are: fast electron generation, bulk plasma heating, short and long-term plasma parameter rise and decay rates, plasma potential modulation and transient phenomena. The influence of these phenomena on the ion energy and ion energy flux at the substrate is discussed. This review, although not exhaustive, will serve as a useful guide for more in-depth investigations using the referenced literature and also hopefully as an inspiration for future studies.

Innovative non-thermal plasma disinfection process inside sealed bags: Assessment of bactericidal and sporicidal effectiveness in regard to current sterilization norms

PubMed Central

Charpentier, Emilie; Le-Bras, Florian; Maho, Thomas; Robert, Eric; Pouvesle, Jean-Michel; Polidor, Franck; Gangloff, Sophie C.; Boudifa, Mohamed

2017-01-01

In this work, we developed a device capable to generate a non-thermal plasma discharge inside a sealed bag. The aim of this study was to assess the effectiveness of the oxygen, nitrogen and argon plasma sterilization on Pseudomonas aeruginosa, Staphylococcus aureus and Bacillus subtilis spores according to the NF EN 556 Norm. Moreover the bag integrity which is a critical key to maintain the sterile state of items after the end of the process was verified by Fourier Transform Infrared (FTIR) and X-ray Photoelectron Spectrometry (XPS) analyses. After plasma treatments, the bacterial counting showed a 6 log reduction of P. aeruginosa and S. aureus in 45 min and 120 min respectively whatever the gas used and a 4 log reduction of B. subtilis spores in 120 min with only oxygen plasma. These results were confirmed by Scanning Electron Microscopy (SEM) observations showing altered bacteria or spores and numerous debris. Taking into account the studied microorganisms, the oxygen plasma treatment showed the highest efficiency. FTIR and XPS analyses showed that this treatment induced no significant modification of the bags. To conclude this non-thermal plasma sterilization technique could be an opportunity to sterilize heat and chemical-sensitive medical devices and to preserve their sterile state after the end of the process. PMID:28662202

Informing the Human Plasma Protein Binding of Environmental Chemicals by Machine Learning in the Pharmaceutical Space: Applicability Domain and Limits of Predictability

EPA Science Inventory

The free fraction of a xenobiotic in plasma (Fub) is an important determinant of chemical adsorption, distribution, metabolism, elimination, and toxicity, yet experimental plasma protein binding data is scarce for environmentally relevant chemicals. The presented work explores th...

Plasma - enhanced dispersion of metal and ceramic nanoparticles in polymer nanocomposite films

NASA Astrophysics Data System (ADS)

Maguire, Paul; Liu, Yazi; Askari, Sadegh; Patel, Jenish; Macia-Montero, Manuel; Mitra, Somak; Zhang, Richao; Sun, Dan; Mariotti, Davide

2015-09-01

In this work we demonstrate a facile method to synthesize a nanoparticle/PEDOT:PSS hybrid nanocomposite material in aqueous solution through atmospheric pressure direct current (DC) plasma processing at room temperature. Both metal (Au) and ceramic (TiO2) nanoparticle composite films have been fabricated. Nanoparticle dispersion is enhanced considerable and remains stable. TiO2/polymer hybrid nanoparticles with a distinct core shell structure have been obtained. Increased nanoparticle/PEDOT:PSS nanocomposite electrical conductivity has been observed. The improvement in nanocomposite properties is due to the enhanced dispersion and stability in liquid polymer of microplasma processed Au or TiO2 nanoparticles. Both plasma induced surface charge and nanoparticle surface termination with specific plasma chemical species are thought to provide an enhanced barrier to nanoparticle agglomeration and promote nanoparticle-polymer bonding. This is expected to have a significant benefit in materials processing with inorganic nanoparticles for applications in energy storage, photocatalysis and biomedical sensors. Engineering and Physical Sciences Research Council (EPSRC: EP/K006088/1, EP/K006142, Nos. EP/K022237/1).

The Quest for Value-Added Products from Carbon Dioxide and Water in a Dielectric Barrier Discharge: A Chemical Kinetics Study.

PubMed

Snoeckx, Ramses; Ozkan, Alp; Reniers, Francois; Bogaerts, Annemie

2017-01-20

Recycling of carbon dioxide by its conversion into value-added products has gained significant interest owing to the role it can play for use in an anthropogenic carbon cycle. The combined conversion with H 2 O could even mimic the natural photosynthesis process. An interesting gas conversion technique currently being considered in the field of CO 2 conversion is plasma technology. To investigate whether it is also promising for this combined conversion, we performed a series of experiments and developed a chemical kinetics plasma chemistry model for a deeper understanding of the process. The main products formed were the syngas components CO and H 2 , as well as O 2 and H 2 O 2 , whereas methanol formation was only observed in the parts-per-billion to parts-per-million range. The syngas ratio, on the other hand, could easily be controlled by varying both the water content and/or energy input. On the basis of the model, which was validated with experimental results, a chemical kinetics analysis was performed, which allowed the construction and investigation of the different pathways leading to the observed experimental results and which helped to clarify these results. This approach allowed us to evaluate this technology on the basis of its underlying chemistry and to propose solutions on how to further improve the formation of value-added products by using plasma technology. © 2017 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

Effects of plasma pretreatment on the process of self-forming Cu-Mn alloy barriers for Cu interconnects

NASA Astrophysics Data System (ADS)

Park, Jae-Hyung; Han, Dong-Suk; Kim, Kyoung-Deok; Park, Jong-Wan

2018-02-01

This study investigated the effect of plasma pretreatment on the process of a self-forming Cu-Mn alloy barrier on porous low-k dielectrics. To study the effects of plasma on the performance of a self-formed Mn-based barrier, low-k dielectrics were pretreated with H2 plasma or NH3 plasma. Cu-Mn alloy materials on low-k substrates that were subject to pretreatment with H2 plasma exhibited lower electrical resistivity values and the formation of thicker Mn-based interlayers than those on low-k substrates that were subject to pretreatment with NH3 plasma. Transmission electron microscopy (TEM), X-ray photoemission spectroscopy (XPS), and thermal stability analyses demonstrated the exceptional performance of the Mn-based interlayer on plasma-pretreated low-k substrates with regard to thickness, chemical composition, and reliability. Plasma treating with H2 gas formed hydrophilic Si-OH bonds on the surface of the low-k layer, resulting in Mn-based interlayers with greater thickness after annealing. However, additional moisture uptake was induced on the surface of the low-k dielectric, degrading electrical reliability. By contrast, plasma treating with NH3 gas was less effective with regard to forming a Mn-based interlayer, but produced a Si-N/C-N layer on the low-k surface, yielding improved barrier characteristics.

Diamond surface functionalization with biomimicry - Amine surface tether and thiol moiety for electrochemical sensors

NASA Astrophysics Data System (ADS)

Sund, James B.; Causey, Corey P.; Wolter, Scott D.; Parker, Charles B.; Stoner, Brian R.; Toone, Eric J.; Glass, Jeffrey T.

2014-05-01

The surface of conducting diamond was functionalized with a terminal thiol group that is capable of binding and detecting nitrogen-oxygen species. The functionalization process employed multiple steps starting with doped diamond films grown by plasma enhanced chemical vapor deposition followed by hydrogen termination and photochemical attachment of a chemically protected amine alkene. The surface tether was deprotected to reveal the amine functionality, which enabled the tether to be extended with surface chemistry to add a terminal thiol moiety for electrochemical sensing applications. Each step of the process was validated using X-ray photoelectron spectroscopy analysis.

Fast combustion waves and chemi-ionization processes in a flame initiated by a powerful local plasma source in a closed reactor

PubMed Central

Artem'ev, K. V.; Berezhetskaya, N. K.; Kazantsev, S. Yu.; Kononov, N. G.; Kossyi, I. A.; Popov, N. A.; Tarasova, N. M.; Filimonova, E. A.; Firsov, K. N.

2015-01-01

Results are presented from experimental studies of the initiation of combustion in a stoichiometric methane–oxygen mixture by a freely localized laser spark and by a high-current multispark discharge in a closed chamber. It is shown that, preceding the stage of ‘explosive’ inflammation of a gas mixture, there appear two luminous objects moving away from the initiator along an axis: a relatively fast and uniform wave of ‘incomplete combustion’ under laser spark ignition and a wave with a brightly glowing plasmoid behind under ignition from high-current slipping surface discharge. The gas mixtures in both the ‘preflame’ and developed-flame states are characterized by a high degree of ionization as the result of chemical ionization (plasma density ne≈1012 cm−3) and a high frequency of electron–neutral collisions (νen≈1012 s−1). The role of chemical ionization in constructing an adequate theory for the ignition of a gas mixture is discussed. The feasibility of the microwave heating of both the preflame and developed-flame plasma, supplementary to a chemical energy source, is also discussed. PMID:26170426

CHEMKIN-III: A FORTRAN chemical kinetics package for the analysis of gas-phase chemical and plasma kinetics

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kee, R.J.; Rupley, F.M.; Meeks, E.

1996-05-01

This document is the user`s manual for the third-generation CHEMKIN package. CHEMKIN is a software package whose purpose is to facilitate the formation, solution, and interpretation of problems involving elementary gas-phase chemical kinetics. It provides a flexible and powerful tool for incorporating complex chemical kinetics into simulations of fluid dynamics. The package consists of two major software components: an Interpreter and a Gas-Phase Subroutine Library. The Interpreter is a program that reads a symbolic description of an elementary, user-specified chemical reaction mechanism. One output from the Interpreter is a data file that forms a link to the Gas-Phase Subroutine Library.more » This library is a collection of about 100 highly modular FORTRAN subroutines that may be called to return information on equations of state, thermodynamic properties, and chemical production rates. CHEMKIN-III includes capabilities for treating multi-fluid plasma systems, that are not in thermal equilibrium. These new capabilities allow researchers to describe chemistry systems that are characterized by more than one temperature, in which reactions may depend on temperatures associated with different species; i.e. reactions may be driven by collisions with electrons, ions, or charge-neutral species. These new features have been implemented in such a way as to require little or no changes to CHEMKIN implementation for systems in thermal equilibrium, where all species share the same gas temperature. CHEMKIN-III now has the capability to handle weakly ionized plasma chemistry, especially for application related to advanced semiconductor processing.« less

Mechanistic study of plasma damage to porous low-k: Process development and dielectric recovery

NASA Astrophysics Data System (ADS)

Shi, Hualiang

Low-k dielectrics with porosity are being introduced to reduce the RC delay of Cu/low-k interconnect. However, during the O2 plasma ashing process, the porous low-k dielectrics tend to degrade due to methyl depletion, moisture uptake, and densification, increasing the dielectric constant and leakage current. This dissertation presents a study of the mechanisms of plasma damage and dielectric recovery. The kinetics of plasma interaction with low-k dielectrics was investigated both experimentally and theoretically. By using a gap structure, the roles of ion, photon, and radical in producing damage on low-k dielectrics were differentiated. Oxidative plasma induced damage was proportional to the oxygen radical density, enhanced by VUV photon, and increased with substrate temperature. Ion bombardment induced surface densification, blocking radical diffusion. Two analytical models were derived to quantify the plasma damage. Based on the radical diffusion, reaction, and recombination inside porous low-k dielectrics, a plasma altered layer model was derived to interpret the chemical effect in the low ion energy region. It predicted that oxidative plasma induced damage can be reduced by decreasing pore radius, substrate temperature, and oxygen radical density and increasing carbon concentration and surface recombination rate inside low-k dielectrics. The model validity was verified by experiments and Monte-Carlo simulations. This model was also extended to the patterned low-k structure. Based on the ion collision cascade process, a sputtering yield model was introduced to interpret the physical effect in the high ion energy region. The model validity was verified by checking the ion angular and energy dependences of sputtering yield using O2/He/Ar plasma, low-k dielectrics with different k values, and a Faraday cage. Low-k dielectrics and plasma process were optimized to reduce plasma damage, including increasing carbon concentration in low-k dielectrics, switching plasma generator from ICP to RIE, increasing hard mask thickness, replacing O2 by CO2 plasma, increasing CO addition in CO/O 2 plasma, and increasing N2 addition in CO2/N 2 plasma. By combining analytical techniques with the Kramers-Kronig dispersion relation and quantum chemistry calculation, the origin of dielectric loss was ascribed to the physisorbed water molecules. Post-ash CH4 plasma treatment, vapor silylation process, and UV radiation were developed to repair plasma damage.

Photoluminescence from PP-HMDSO thin films deposited using a remote plasma of 13.56 MHz hollow cathode discharge

NASA Astrophysics Data System (ADS)

Naddaf, M.; Saloum, S.; Hamadeh, H.

2007-07-01

Room temperature photoluminescence (PL) from plasma-polymerized hexamethyldisiloxane (PP-HMDSO) thin films deposited on silicon wafers has been investigated as a function of both the applied RF power and the monomer flow rate. Films were deposited in a low pressure-low temperature remote plasma ignited in a 13.56 MHz hollow cathode discharge reactor, using pure HMDSO as a monomer and Ar as a feed gas. The substrate temperature during the deposition was as low as 40 °C and the total pressure was about 0.03 mbar. Optical emission spectroscopy (OES) has been used as in situ tool for monitoring the different chemical species present in the plasma during deposition processes. The deposited PP-HMDSO films showed a strong, broad 'green/yellow' PL band. The RF power and the flow rate of the HMDSO monomer are found to have a significant impact on the PL intensity of the deposited film. The changes in the chemical bonding of the film as a function of deposition parameters have been investigated by using the Fourier transform infrared (FTIR) spectroscopic analysis and are related to PL and OES results. The 'green/yellow' PL band is ascribed to chemical groups and bonds of silicon, hydrogen and/or oxygen constituting the films, in particular, SiH, SiO bonds and silanol Si-O-H groups.

Decomposition of toluene in a steady-state atmospheric-pressure glow discharge

NASA Astrophysics Data System (ADS)

Trushkin, A. N.; Grushin, M. E.; Kochetov, I. V.; Trushkin, N. I.; Akishev, Yu. S.

2013-02-01

Results are presented from experimental studies of decomposition of toluene (C6H5CH3) in a polluted air flow by means of a steady-state atmospheric pressure glow discharge at different water vapor contents in the working gas. The experimental results on the degree of C6H5CH3 removal are compared with the results of computer simulations conducted in the framework of the developed kinetic model of plasma chemical decomposition of toluene in the N2: O2: H2O gas mixture. A substantial influence of the gas flow humidity on toluene decomposition in the atmospheric pressure glow discharge is demonstrated. The main mechanisms of the influence of humidity on C6H5CH3 decomposition are determined. The existence of two stages in the process of toluene removal, which differ in their duration and the intensity of plasma chemical decomposition of C6H5CH3 is established. Based on the results of computer simulations, the composition of the products of plasma chemical reactions at the output of the reactor is analyzed as a function of the specific energy deposition and gas flow humidity. The existence of a catalytic cycle in which hydroxyl radical OH acts a catalyst and which substantially accelerates the recombination of oxygen atoms and suppression of ozone generation when the plasma-forming gas contains water vapor is established.

Surface roughness analysis of SiO2 for PECVD, PVD and IBD on different substrates

NASA Astrophysics Data System (ADS)

Amirzada, Muhammad Rizwan; Tatzel, Andreas; Viereck, Volker; Hillmer, Hartmut

2016-02-01

This study compares surface roughness of SiO2 thin layers which are deposited by three different processes (plasma-enhanced chemical vapor deposition, physical vapor deposition and ion beam deposition) on three different substrates (glass, Si and polyethylene naphthalate). Plasma-enhanced chemical vapor deposition (PECVD) processes using a wide range of deposition temperatures from 80 to 300 °C have been applied and compared. It was observed that the nature of the substrate does not influence the surface roughness of the grown layers very much. It is also perceived that the value of the surface roughness keeps on increasing as the deposition temperature of the PECVD process increases. This is due to the increase in the surface diffusion length with the rise in substrate temperature. The layers which have been deposited on Si wafer by ion beam deposition (IBD) process are found to be smoother as compared to the other two techniques. The layers which have been deposited on the glass substrates using PECVD reveal the highest surface roughness values in comparison with the other substrate materials and techniques. Different existing models describing the dynamics of clusters on surfaces are compared and discussed.

Optimization of PECVD Chamber Cleans Through Fundamental Studies of Electronegative Fluorinated Gas Discharges.

NASA Astrophysics Data System (ADS)

Langan, John

1996-10-01

The predominance of multi-level metalization schemes in advanced integrated circuit manufacturing has greatly increased the importance of plasma enhanced chemical vapor deposition (PECVD) and in turn in-situ plasma chamber cleaning. In order to maintain the highest throughput for these processes the clean step must be as short as possible. In addition, there is an increasing desire to minimize the fluorinated gas usage during the clean, while maximizing its efficiency, not only to achieve lower costs, but also because many of the gases used in this process are global warming compounds. We have studied the fundamental properties of discharges of NF_3, CF_4, and C_2F6 under conditions relevant to chamber cleaning in the GEC rf reference cell. Using electrical impedance analysis and optical emission spectroscopy we have determined that the electronegative nature of these discharges defines the optimal processing conditions by controlling the power coupling efficiency and mechanisms of power dissipation in the discharge. Examples will be presented where strategies identified by these studies have been used to optimize actual manufacturing chamber clean processes. (This work was performed in collaboration with Mark Sobolewski, National Institute of Standards and Technology, and Brian Felker, Air Products and Chemicals, Inc.)

Plasma Nitriding of AISI 304 Stainless Steel in Cathodic and Floating Electric Potential: Influence on Morphology, Chemical Characteristics and Tribological Behavior

NASA Astrophysics Data System (ADS)

Li, Yang; He, Yongyong; Wang, Wei; Mao, Junyuan; Zhang, Lei; Zhu, Yijie; Ye, Qianwen

2018-03-01

In direct current plasma nitriding (DCPN), the treated components are subjected to a high cathodic potential, which brings several inherent shortcomings, e.g., damage by arcing and the edging effect. In active screen plasma nitriding (ASPN) processes, the cathodic potential is applied to a metal screen that surrounds the workload, and the component to be treated is placed in a floating potential. Such an electrical configuration allows plasma to be formed on the metal screen surface rather than on the component surface; thus, the shortcomings of the DCPN are eliminated. In this work, the nitrided experiments were performed using a plasma nitriding unit. Two groups of samples were placed on the table in the cathodic and the floating potential, corresponding to the DCPN and ASPN, respectively. The floating samples and table were surrounded by a steel screen. The DCPN and ASPN of the AISI 304 stainless steels are investigated as a function of the electric potential. The samples were characterized using scanning electron microscopy with energy-dispersive x-ray spectroscopy, x-ray diffraction, atomic force microscopy and transmission electron microscope. Dry sliding ball-on-disk wear tests were conducted on the untreated substrate, DCPN and ASPN samples. The results reveal that all nitrided samples successfully produced similar nitrogen-supersaturated S phase layers on their surfaces. This finding also shows the strong impact of the electric potential of the nitriding process on the morphology, chemical characteristics, hardness and tribological behavior of the DCPN and ASPN samples.

Plasma enhanced chemical vapor deposition of titanium nitride thin films using cyclopentadienyl cycloheptatrienyl titanium

NASA Astrophysics Data System (ADS)

Charatan, R. M.; Gross, M. E.; Eaglesham, D. J.

1994-10-01

The use of a low oxidation state Ti compound, cyclopentadienyl cycloheptatrienyl titanium, (C5H5) Ti(C7H7) (CPCHT), as a potential source for TiN and Ti in plasma enhanced chemical vapor deposition processes has been investigated. This precursor provides us with a new chemical vapor deposition route to TiN films that offer an interesting contrast to films deposited from Ti(IV) precursors. Film depositions were carried out by introducing CPCHT, with H2 carrier gas, into the downstream region of a NH3, N2, H2, or mixed H2/N2 plasma. Low resistivity (100-250 micro-ohm cm) nitrogen-rich TiN films with little carbon or oxygen incorporation and good conformality were deposited with activated N2 or NH3 at deposition temperatures of 300-600 C, inclusive. Mixed H2/N2 plasmas resulted in more stoichiometric TiN films with similar properties. The most striking feature of these films is the absence of columnar grain growth, in contrast to TiN films deposited using TiCl4 or Ti(NR(2))(4). Although the film texture was influenced by the plasma gas, the average grain size of the films deposited using activated N2 and NH3 was similar. The TiN films that we deposited were effective diffusion barriers between aluminum and silicon up to 575 C. Depositions using activated H2 resulted in films with significantly less carbon than CPCHT, but still having a minimum of 2.7:1 C:Ti. The lower oxidation state of the precursor did not facilitate the deposition of a Ti-rich film. No depositions were observed with any of the reactant gases in the absence of plasmas activation.

Modeling of non-thermal plasma in flammable gas mixtures

NASA Astrophysics Data System (ADS)

Napartovich, A. P.; Kochetov, I. V.; Leonov, S. B.

2008-07-01

An idea of using plasma-assisted methods of fuel ignition is based on non-equilibrium generation of chemically active species that speed up the combustion process. It is believed that gain in energy consumed for combustion acceleration by plasmas is due to the non-equilibrium nature of discharge plasma, which allows radicals to be produced in an above-equilibrium amount. Evidently, the size of the effect is strongly dependent on the initial temperature, pressure, and composition of the mixture. Of particular interest is comparison between thermal ignition of a fuel-air mixture and non-thermal plasma initiation of the combustion. Mechanisms of thermal ignition in various fuel-air mixtures have been studied for years, and a number of different mechanisms are known providing an agreement with experiments at various conditions. The problem is -- how to conform thermal chemistry approach to essentially non-equilibrium plasma description. The electric discharge produces much above-equilibrium amounts of chemically active species: atoms, radicals and ions. The point is that despite excess concentrations of a number of species, total concentration of these species is far below concentrations of the initial gas mixture. Therefore, rate coefficients for reactions of these discharge produced species with other gas mixture components are well known quantities controlled by the translational temperature, which can be calculated from the energy balance equation taking into account numerous processes initiated by plasma. A numerical model was developed combining traditional approach of thermal combustion chemistry with advanced description of the plasma kinetics based on solution of electron Boltzmann equation. This approach allows us to describe self-consistently strongly non-equilibrium electric discharge in chemically unstable (ignited) gas. Equations of pseudo-one-dimensional gas dynamics were solved in parallel with a system of thermal chemistry equations, kinetic equations for charged particles (electrons, positive and negative ions), and with the electric circuit equation. The electric circuit comprises power supply, ballast resistor connected in series with the discharge and capacity. Rate coefficients for electron-assisted reactions were calculated from solving the two-term spherical harmonic expansion of the Boltzmann equation. Such an approach allows us to describe influence of thermal chemistry reactions (burning) on the discharge characteristics. Results of comparison between the discharge and thermal ignition effects for mixtures of hydrogen or ethylene with dry air will be reported. Effects of acceleration of ignition by discharge plasma will be analyzed. In particular, the role of singlet oxygen produced effectively in the discharge in ignition speeding up will be discussed.

Characterization of the human plasma phosphoproteome using linear ion trap mass spectrometry and multiple search engines.

PubMed

Carrascal, Montserrat; Gay, Marina; Ovelleiro, David; Casas, Vanessa; Gelpí, Emilio; Abian, Joaquin

2010-02-05

Major plasma protein families play different roles in blood physiology and hemostasis and in immunodefense. Other proteins in plasma can be involved in signaling as chemical messengers or constitute biological markers of the status of distant tissues. In this respect, the plasma phosphoproteome holds potentially relevant information on the mechanisms modulating these processes through the regulation of protein activity. In this work we describe for the first time a collection of phosphopeptides identified in human plasma using immunoaffinity separation of the seven major serum protein families from other plasma proteins, SCX fractionation, and TiO(2) purification prior to LC-MS/MS analysis. One-hundred and twenty-seven phosphosites in 138 phosphopeptides mapping 70 phosphoproteins were identified with FDR < 1%. A high-confidence collection of phosphosites was obtained using a combined search with the OMSSA, SEQUEST, and Phenyx search engines.

Tracing the plasma interactions for pulsed reactive crossed-beam laser ablation

NASA Astrophysics Data System (ADS)

Chen, Jikun; Stender, Dieter; Pichler, Markus; Döbeli, Max; Pergolesi, Daniele; Schneider, Christof W.; Wokaun, Alexander; Lippert, Thomas

2015-10-01

Pulsed reactive crossed-beam laser ablation is an effective technique to govern the chemical activity of plasma species and background molecules during pulsed laser deposition. Instead of using a constant background pressure, a gas pulse with a reactive gas, synchronized with the laser beam, is injected into vacuum or a low background pressure near the ablated area of the target. It intercepts the initially generated plasma plume, thereby enhancing the physicochemical interactions between the gaseous environment and the plasma species. For this study, kinetic energy resolved mass-spectrometry and time-resolved plasma imaging were used to study the physicochemical processes occurring during the reactive crossed beam laser ablation of a partially 18O substituted La0.6Sr0.4MnO3 target using oxygen as gas pulse. The characteristics of the ablated plasma are compared with those observed during pulsed laser deposition in different oxygen background pressures.

Chemical Changes in Nonthermal Plasma-Treated N-Acetylcysteine (NAC) Solution and Their Contribution to Bacterial Inactivation.

PubMed

Ercan, Utku K; Smith, Josh; Ji, Hai-Feng; Brooks, Ari D; Joshi, Suresh G

2016-02-02

In continuation of our previous reports on the broad-spectrum antimicrobial activity of atmospheric non-thermal dielectric barrier discharge (DBD) plasma treated N-Acetylcysteine (NAC) solution against planktonic and biofilm forms of different multidrug resistant microorganisms, we present here the chemical changes that mediate inactivation of Escherichia coli. In this study, the mechanism and products of the chemical reactions in plasma-treated NAC solution are shown. UV-visible spectrometry, FT-IR, NMR, and colorimetric assays were utilized for chemical characterization of plasma treated NAC solution. The characterization results were correlated with the antimicrobial assays using determined chemical species in solution in order to confirm the major species that are responsible for antimicrobial inactivation. Our results have revealed that plasma treatment of NAC solution creates predominantly reactive nitrogen species versus reactive oxygen species, and the generated peroxynitrite is responsible for significant bacterial inactivation.

Chemical Changes in Nonthermal Plasma-Treated N-Acetylcysteine (NAC) Solution and Their Contribution to Bacterial Inactivation

PubMed Central

Ercan, Utku K.; Smith, Josh; Ji, Hai-Feng; Brooks, Ari D.; Joshi, Suresh G.

2016-01-01

In continuation of our previous reports on the broad-spectrum antimicrobial activity of atmospheric non-thermal dielectric barrier discharge (DBD) plasma treated N-Acetylcysteine (NAC) solution against planktonic and biofilm forms of different multidrug resistant microorganisms, we present here the chemical changes that mediate inactivation of Escherichia coli. In this study, the mechanism and products of the chemical reactions in plasma-treated NAC solution are shown. UV-visible spectrometry, FT-IR, NMR, and colorimetric assays were utilized for chemical characterization of plasma treated NAC solution. The characterization results were correlated with the antimicrobial assays using determined chemical species in solution in order to confirm the major species that are responsible for antimicrobial inactivation. Our results have revealed that plasma treatment of NAC solution creates predominantly reactive nitrogen species versus reactive oxygen species, and the generated peroxynitrite is responsible for significant bacterial inactivation. PMID:26832829

Cobalt and iron segregation and nitride formation from nitrogen plasma treatment of CoFeB surfaces

NASA Astrophysics Data System (ADS)

Mattson, E. C.; Michalak, D. J.; Veyan, J. F.; Chabal, Y. J.

2017-02-01

Cobalt-iron-boron (CoFeB) thin films are the industry standard for ferromagnetic layers in magnetic tunnel junction devices and are closely related to the relevant surfaces of CoFe-based catalysts. Identifying and understanding the composition of their surfaces under relevant processing conditions is therefore critical. Here we report fundamental studies on the interaction of nitrogen plasma with CoFeB surfaces using infrared spectroscopy, x-ray photoemission spectroscopy, and low energy ion scattering. We find that, upon exposure to nitrogen plasma, clean CoFeB surfaces spontaneously reorganize to form an overlayer comprised of Fe2N3 and BN, with the Co atoms moved well below the surface through a chemically driven process. Subsequent annealing to 400 °C removes nitrogen, resulting in a Fe-rich termination of the surface region.

Hydrodynamic and Chemical Modeling of a Chemical Vapor Deposition Reactor for Zirconia Deposition

NASA Astrophysics Data System (ADS)

Belmonte, T.; Gavillet, J.; Czerwiec, T.; Ablitzer, D.; Michel, H.

1997-09-01

Zirconia is deposited on cylindrical substrates by flowing post-discharge enhanced chemical vapor deposition. In this paper, a two dimensional hydrodynamic and chemical modeling of the reactor is described for given plasma characteristics. It helps in determining rate constants of the synthesis reaction of zirconia in gas phase and on the substrate which is ZrCl4 hydrolysis. Calculated deposition rate profiles are obtained by modeling under various conditions and fits with a satisfying accuracy the experimental results. The role of transport processes and the mixing conditions of excited gases with remaining ones are studied. Gas phase reaction influence on the growth rate is also discussed.

Prereduction of Metal Oxides via Carbon Plasma Treatment for Efficient and Stable Electrocatalytic Hydrogen Evolution.

PubMed

Zhang, Yongqi; Ouyang, Bo; Xu, Kun; Xia, Xinhui; Zhang, Zheng; Rawat, Rajdeep Singh; Fan, Hong Jin

2018-04-01

Prereduction of transition metal oxides is a feasible and efficient strategy to enhance their catalytic activity for hydrogen evolution. Unfortunately, the prereduction via the common H 2 annealing method is unstable for nanomaterials during the hydrogen evolution process. Here, using NiMoO 4 nanowire arrays as the example, it is demonstrated that carbon plasma (C-plasma) treatment can greatly enhance both the catalytic activity and the long-term stability of transition metal oxides for hydrogen evolution. The C-plasma treatment has two functions at the same time: it induces partial surface reduction of the NiMoO 4 nanowire to form Ni 4 Mo nanoclusters, and simultaneously deposits a thin graphitic carbon shell. As a result, the C-plasma treated NiMoO 4 can maintain its array morphology, chemical composition, and catalytic activity during long-term intermittent hydrogen evolution process. This work may pave a new way for simultaneous activation and stabilization of transition metal oxide-based electrocatalysts. © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Research on the discharge characteristics for water tree in crosslinked polyethylene cable based on plasma-chemical model

NASA Astrophysics Data System (ADS)

Fan, Yang; Qi, Yang; Bing, Gao; Rong, Xia; Yanjie, Le; Iroegbu, Paul Ikechukwu

2018-03-01

Water tree is the predominant defect in high-voltage crosslinked polyethylene cables. The microscopic mechanism in the discharge process is not fully understood; hence, a drawback is created towards an effective method to evaluate the insulation status. In order to investigate the growth of water tree, a plasma-chemical model is developed. The dynamic characteristics of the discharge process including voltage waveform, current waveform, electron density, electric potential, and electric field intensity are analyzed. Our results show that the distorted electric field is the predominant contributing factor of electron avalanche formation, which inevitably leads to the formation of pulse current. In addition, it is found that characteristic parameters such as the pulse width and pulse number have a great relevance to the length of water tree. Accordingly, the growth of water tree can be divided into the initial stage, development stage, and pre-breakdown stage, which provides a reference for evaluating the deteriorated stages of crosslinked polyethylene cables.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Detering, B.A.; Kong, P.C.; Thomas, C.P.

This paper describes the experimental demonstration of a process for direct conversion of methane to acetylene in a thermal plasma. The process utilizes a thermal plasma to dissociate methane and form an equilibrium mixture of acetylene followed by a supersonic expansion of the hot gas to preserve the produced acetylene in high yield. The high translational velocities and rapid cooling result in an overpopulation of atomic hydrogen which persists throughout the expansion process. The presence of atomic hydrogen shifts the equilibrium composition by inhibiting complete pyrolysis of methane and acetylene to solid carbon. This process has the potential to reducemore » the cost of producing acetylene from natural gas. Acetylene and hydrogen produced by this process could be used directly as industrial gases, building blocks for synthesis of industrial chemicals, or oligomerized to long chain liquid hydrocarbons for use as fuels. This process produces hydrogen and ultrafine carbon black in addition to acetylene.« less

Investigation of the effects of plasma treatments on biodeteriorated ancient paper

NASA Astrophysics Data System (ADS)

Laguardia, L.; Vassallo, E.; Cappitelli, F.; Mesto, E.; Cremona, A.; Sorlini, C.; Bonizzoni, G.

2005-11-01

Deterioration of paper-based materials is mainly due to the degradation of cellulose caused by a lot of factors such as chemical attack due to acidic hydrolysis, oxidative agent, light, air pollution and biological attack and also due to the presence of microorganisms like bacteria and fungi. It is therefore desirable to focus the research activities on restoration and conservation techniques to develop appropriate treatments. The aim of this paper is the removal or reduction of the microbial contamination and paper consolidation by means of plasma treatment. For plasma processes, different gas mixtures are utilised, and the different gas mixtures are compared as a function of pressure, power, and treatment time. To demonstrate the efficiency of the sterilisation treatment, two fungi: Aspergillus niger and Penicillium funiculosum, commonly found in libraries and archives were spread on naturally aged paper (19th century). Microorganisms were let to grow by using the organic compounds found in the historical records as a sole source of carbon and energy. The microbial abatement was measured before and after the plasma treatment by using the standard plate count method. Surface chemical and morphological characterisation of paper before and after plasma treatment has been carried out by X-ray photoelectron spectroscopy (XPS) and ATR infrared spectroscopy (ATR FTIR). The tensile strength of the plasma-treated papers was also determined. CNR Patent, n° Mi2004A000068, 21/01/2004.

Effect of the chamber wall on fluorocarbon-assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma

PubMed Central

Kawakami, Masatoshi; Metzler, Dominik; Li, Chen; Oehrlein, Gottlieb S.

2016-01-01

The authors studied the effect of the temperature and chemical state of the chamber wall on process performance for atomic layer etching of SiO2 using a steady-state Ar plasma, periodic injection of a defined number of C4F8 molecules, and synchronized plasma-based Ar+ ion bombardment. To evaluate these effects, the authors measured the quartz coupling window temperature. The plasma gas phase chemistry was characterized using optical emission spectroscopy. It was found that although the thickness of the polymer film deposited in each cycle is constant, the etching behavior changed, which is likely related to a change in the plasma gas phase chemistry. The authors found that the main gas phase changes occur after C4F8 injection. The C4F8 and the quartz window react and generate SiF and CO. The emission intensity changes with wall surface state and temperature. Therefore, changes in the plasma gas species generation can lead to a shift in etching performance during processing. During initial cycles, minimal etching is observed, while etching gradually increases with cycle number. PMID:27375342

Surface processing and ageing behavior of silk fabrics treated with atmospheric-pressure plasma for pigment-based ink-jet printing

NASA Astrophysics Data System (ADS)

Zhang, Chunming; Wang, Libing; Yu, Miao; Qu, Lijun; Men, Yajing; Zhang, Xiangwu

2018-03-01

Pigment inkjet printing has highlighted the advantages of cost-effective, short production cycle and environment-friendly. However, patterns directly printed with pigment inks usually have low color yields and blurry images which are caused by bleeding phenomenon. This work presents an atmospheric-pressure plasma method for improving the pigment-based ink-jet printing performance of silk fabrics. The effects of surface changes induced are discussed, with data derived from morphological study by atomic force microscopy (AFM), chemical analysis using X-ray photoelectron spectroscopy (XPS) and contact angle measurement. Ink-jet printing experiments were conducted to study the influence of measured changes on anti-bleeding property and color strength of treated and original samples. The ageing experiment indicates that the modified silk fabrics should be printed within 24 h after plasma processing for maximum color yields. This study explores an effective approach for the atmospheric-pressure plasma, which can provide its significant use in improving the surface properties and ink-jet printing performance of fabrics.

Super-Resolution Microscopy: Shedding Light on the Cellular Plasma Membrane.

PubMed

Stone, Matthew B; Shelby, Sarah A; Veatch, Sarah L

2017-06-14

Lipids and the membranes they form are fundamental building blocks of cellular life, and their geometry and chemical properties distinguish membranes from other cellular environments. Collective processes occurring within membranes strongly impact cellular behavior and biochemistry, and understanding these processes presents unique challenges due to the often complex and myriad interactions between membrane components. Super-resolution microscopy offers a significant gain in resolution over traditional optical microscopy, enabling the localization of individual molecules even in densely labeled samples and in cellular and tissue environments. These microscopy techniques have been used to examine the organization and dynamics of plasma membrane components, providing insight into the fundamental interactions that determine membrane functions. Here, we broadly introduce the structure and organization of the mammalian plasma membrane and review recent applications of super-resolution microscopy to the study of membranes. We then highlight some inherent challenges faced when using super-resolution microscopy to study membranes, and we discuss recent technical advancements that promise further improvements to super-resolution microscopy and its application to the plasma membrane.

Enhanced Dispersion of TiO2 Nanoparticles in a TiO2/PEDOT:PSS Hybrid Nanocomposite via Plasma-Liquid Interactions

NASA Astrophysics Data System (ADS)

Liu, Yazi; Sun, Dan; Askari, Sadegh; Patel, Jenish; Macias-Montero, Manuel; Mitra, Somak; Zhang, Richao; Lin, Wen-Feng; Mariotti, Davide; Maguire, Paul

2015-10-01

A facile method to synthesize a TiO2/PEDOT:PSS hybrid nanocomposite material in aqueous solution through direct current (DC) plasma processing at atmospheric pressure and room temperature has been demonstrated. The dispersion of the TiO2 nanoparticles is enhanced and TiO2/polymer hybrid nanoparticles with a distinct core shell structure have been obtained. Increased electrical conductivity was observed for the plasma treated TiO2/PEDOT:PSS nanocomposite. The improvement in nanocomposite properties is due to the enhanced dispersion and stability in liquid polymer of microplasma treated TiO2 nanoparticles. Both plasma induced surface charge and nanoparticle surface termination with specific plasma chemical species are proposed to provide an enhanced barrier to nanoparticle agglomeration and promote nanoparticle-polymer binding.

Method of processing a substrate

DOEpatents

Babayan, Steven E [Huntington Beach, CA; Hicks, Robert F [Los Angeles, CA

2008-02-12

The invention is embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and a substrate or work piece is placed in the gas flow downstream of the electrodes, such that said substrate or work piece is substantially uniformly contacted across a large surface area with the reactive gases emanating therefrom. The invention is also embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and one of the grounded electrodes contains a means of mixing in other chemical precursors to combine with the plasma stream, and a substrate or work piece placed in the gas flow downstream of the electrodes, such that said substrate or work piece is contacted by the reactive gases emanating therefrom. In one embodiment, the plasma flow device removes organic materials from a substrate or work piece, and is a stripping or cleaning device. In another embodiment, the plasma flow device kills biological microorganisms on a substrate or work piece, and is a sterilization device. In another embodiment, the plasma flow device activates the surface of a substrate or work piece, and is a surface activation device. In another embodiment, the plasma flow device etches materials from a substrate or work piece, and is a plasma etcher. In another embodiment, the plasma flow device deposits thin films onto a substrate or work piece, and is a plasma-enhanced chemical vapor deposition device or reactor.

Modeling and experimental study on the growth of silicon germanium film by plasma enhanced chemical vapor deposition

NASA Astrophysics Data System (ADS)

Zhao, Lai

Hydrogenated microcrystalline silicon germanium µc-SiGe:H deposited by plasma enhanced chemical vapor deposition (PECVD) is of great interest to photovoltaic (PV) applications due to its low process temperature and good uniformity over large area. The nature of high optical absorption and low optical bandgap makes it promising as the bottom cell absorbing layer for tandem junction solar cells. However, the addition of germane (GeH4) gas changes deposited film properties and makes it rather complicated for the established silane (SiH4) based discharge process with hydrogen (H2) dilution. Despite existing experimental studies for SiH 4/GeH4/H2 3-gas mixture discharge and comprehensive numerical simulations for SiH4/H2 or SiH4/Ar plasma, to the author's best knowledge, a numerical model for both SiH 4 and GeH4 in a high pressure regime is yet to be developed. The plasma discharge, the film growth and their effects on film properties and the solar device performance need deep understanding. In this dissertation, the growth of the µc-SiGe:H film by radio frequency (RF) PECVD is studied through modeling simulation as well as experiments. The first numerical model for the glow discharge of SiH4/GeH 4/H2 3-gas mixture in a high pressure regime is developed based on one dimensional fluid model. Transports of electrons, molecules, radicals and ions in the RF excitation are described by diffusion equations that are coupled with the Poisson's equation. The deposition is integrated as the boundary conditions for discharge equations through the sticking coefficient model. Neutral ionizations, radical dissociations and chemical reactions in the gas phase and surface kinetics such as the diffusive motion, chemical reactions and the hydrogen etching are included with interaction rate constants. Solved with an explicit central-difference discretization scheme, the model simulates mathematical features that reflect the plasma physics such as the plasma sheath and gas species distributions. The model predicts effects of process conditions on the deposition rate and the Ge chemical content which agree well with experimental results. Tandem junction solar devices are fabricated with the developed µc-SiGe:H film as the bottom cell absorbing layer. Film properties are characterized by determining the Ge content with the Raman peak shift and estimating the optical bandgap with the spectral response measurement. The deposition process is investigated following the fractional factorial experiment design in the 5% Ge content window and then in the amorphous-to-microcrystalline phase transition regime. Gradient Ge content structure is also applied to improve the interface. The conversion efficiency is obtained at 10.62% for the device with 1.2µm thick µc-SiGe:H bottom cell, which is higher than that of the reference device with 1.95µm µc-Si:H. This dissertation has demonstrated a powerful modeling tool to study the multi-gas discharge and deposition in the PECVD environment. The physics behind experimental trends is understood by analyzing temporal and spatial distributions of individual gas species and their interactions. It presents the comprehensive understanding of the growth of the µc-SiGe:H film which leads to the realization of high efficiency and high throughput solar cell devices.

Reduced chemical warfare agent sorption in polyurethane-painted surfaces via plasma-enhanced chemical vapor deposition of perfluoroalkanes.

PubMed

Gordon, Wesley O; Peterson, Gregory W; Durke, Erin M

2015-04-01

Perfluoralkalation via plasma chemical vapor deposition has been used to improve hydrophobicity of surfaces. We have investigated this technique to improve the resistance of commercial polyurethane coatings to chemicals, such as chemical warfare agents. The reported results indicate the surface treatment minimizes the spread of agent droplets and the sorption of agent into the coating. The improvement in resistance is likely due to reduction of the coating's surface free energy via fluorine incorporation, but may also have contributing effects from surface morphology changes. The data indicates that plasma-based surface modifications may have utility in improving chemical resistance of commercial coatings.

The Effects of CW (Chemical Warfare)-Related Chemicals on Social Behavior and Performance

DTIC Science & Technology

1984-10-01

Tlerformance; Stress ; Diazepam; 0 I Pyridostigmine; Caffeine, . 󈧊 15 * 19. ABSTRACT (Continue on reverse if necessary and identify by block number...from the animals for assay of plasma stress hormones; this was done both to provide training .-nd experience for the project personnel and to give a...restraining device used to hold the animals while blood is drawn for assay for stress hormones. This adaptation process was begun in mid-November, 1983

Electrical conductivity of a methane-air burning plasma under the action of weak electric fields

NASA Astrophysics Data System (ADS)

Colonna, G.; Pietanza, L. D.; D'Angola, A.; Laricchiuta, A.; Di Vita, A.

2017-02-01

This paper focuses on the calculation of the electrical conductivity of a methane-air flame in the presence of weak electric fields, solving the Boltzmann equation for free electrons self-consistently coupled with chemical kinetics. The chemical model GRI-Mech 3.0 has been completed with chemi-ionization reactions to model ionization in the absence of fields, and a database of cross sections for electron-impact-induced processes to account for reactions and transitions activated in the flame during discharge. The dependence of plasma properties on the frequency of an oscillating field has been studied under different pressure and gas temperature conditions. Fitting expressions of the electrical conductivity as a function of gas temperature and methane consumption are provided for different operational conditions in the Ansaldo Energia burner.

Saturn Magnetospheric Impact on Surface Molecular Chemistry and Astrobiological Potential of Enceladus

NASA Technical Reports Server (NTRS)

Cooper, Paul D.; Cooper, John F.; Sittler, Edward C.; Burger, Matthew H.; Sturner, Steven J.; Rymer, Abigail M.

2008-01-01

The active south polar surface of Enceladus is exposed to strong chemical processing by direct interaction with charged plasma and energetic particles in the local magnetospheric environment of this icy moon. Chemical oxidation activity is suggested by detection of H202 at the surface in this region and less directly by substantial presence of C02, CO, and N2 in the plume gases. Molecular composition of the uppermost surface, including ejecta from plume activity, is radiolytically transformed mostly by penetrating energetic electrons with lesser effects from more depleted populations of energetic protons. The main sources of molecular plasma ions and E-ring dust grains in the magnetospheric environment are the cryovolcanic plume emissions from Enceladus. These molecular ions and the dust grains are chemically processed by magnetospheric interactions that further impact surface chemistry on return to Enceladus. For example, H20 neutrals dominating the emitted plume gas return to the surface mostly as H30+ ions after magnetospheric processing. Surface oxidant loading is further increased by return of radiolytically processed ice grains from the E-ring. Plume frost deposition and micrometeoroid gardening protect some fraction of newly produced molecular species from destruction by further irradiation. The evident horizontal and vertical mobility of surface ices in the south polar region drive mixing of these processed materials into the moon interior with potential impacts on deep ice molecular chemistry and plume gas production. Similarly as suggested previously for Europa, the externally driven source of radiolytic oxidants could affect evolution of life in any subsurface liquid water environments of Enceladus.

Postgrowth Microwave Treatment to Align Carbon Nanotubes

DTIC Science & Technology

2013-03-01

interface material, microwave processing , metal substrate, alignment, contact area, thermal chemical vapor deposition Introduction Since their discovery, CNTs...short forests. The entangled “canopy” of a CNT forest can be removed with additional processing after growth, e.g., plasma etching, to create more...strates for CNT growth at increased manufacturing scale [34]. Studies have shown that CNT forests grown on both sides of metal foils can produce thermal

Plasma deposition of silver nanoparticles on ultrafiltration membranes: antibacterial and anti-biofouling properties.

PubMed

Cruz, Mercedes Cecilia; Ruano, Gustavo; Wolf, Marcus; Hecker, Dominic; Vidaurre, Elza Castro; Schmittgens, Ralph; Rajal, Verónica Beatriz

2015-02-01

A novel and versatile plasma reactor was used to modify Polyethersulphone commercial membranes. The equipment was applied to: i) functionalize the membranes with low-temperature plasmas, ii) deposit a film of poly(methyl methacrylate) (PMMA) by Plasma Enhanced Chemical Vapor Deposition (PECVD) and, iii) deposit silver nanoparticles (SNP) by Gas Flow Sputtering. Each modification process was performed in the same reactor consecutively, without exposure of the membranes to atmospheric air. Scanning electron microscopy and transmission electron microscopy were used to characterize the particles and modified membranes. SNP are evenly distributed on the membrane surface. Particle fixation and transport inside membranes were assessed before- and after-washing assays by X-ray photoelectron spectroscopy depth profiling analysis. PMMA addition improved SNP fixation. Plasma-treated membranes showed higher hydrophilicity. Anti-biofouling activity was successfully achieved against Gram-positive ( Enterococcus faecalis ) and -negative ( Salmonella Typhimurium) bacteria. Therefore, disinfection by ultrafiltration showed substantial resistance to biofouling. The post-synthesis functionalization process developed provides a more efficient fabrication route for anti-biofouling and anti-bacterial membranes used in the water treatment field. To the best of our knowledge, this is the first report of a gas phase condensation process combined with a PECVD procedure in order to deposit SNP on commercial membranes to inhibit biofouling formation.

Plasma deposition of silver nanoparticles on ultrafiltration membranes: antibacterial and anti-biofouling properties

PubMed Central

Cruz, Mercedes Cecilia; Ruano, Gustavo; Wolf, Marcus; Hecker, Dominic; Vidaurre, Elza Castro; Schmittgens, Ralph; Rajal, Verónica Beatriz

2015-01-01

A novel and versatile plasma reactor was used to modify Polyethersulphone commercial membranes. The equipment was applied to: i) functionalize the membranes with low-temperature plasmas, ii) deposit a film of poly(methyl methacrylate) (PMMA) by Plasma Enhanced Chemical Vapor Deposition (PECVD) and, iii) deposit silver nanoparticles (SNP) by Gas Flow Sputtering. Each modification process was performed in the same reactor consecutively, without exposure of the membranes to atmospheric air. Scanning electron microscopy and transmission electron microscopy were used to characterize the particles and modified membranes. SNP are evenly distributed on the membrane surface. Particle fixation and transport inside membranes were assessed before- and after-washing assays by X-ray photoelectron spectroscopy depth profiling analysis. PMMA addition improved SNP fixation. Plasma-treated membranes showed higher hydrophilicity. Anti-biofouling activity was successfully achieved against Gram-positive (Enterococcus faecalis) and -negative (Salmonella Typhimurium) bacteria. Therefore, disinfection by ultrafiltration showed substantial resistance to biofouling. The post-synthesis functionalization process developed provides a more efficient fabrication route for anti-biofouling and anti-bacterial membranes used in the water treatment field. To the best of our knowledge, this is the first report of a gas phase condensation process combined with a PECVD procedure in order to deposit SNP on commercial membranes to inhibit biofouling formation. PMID:26166926

Simulation of toluene decomposition in a pulse-periodic discharge operating in a mixture of molecular nitrogen and oxygen

DOE Office of Scientific and Technical Information (OSTI.GOV)

Trushkin, A. N.; Kochetov, I. V.

The kinetic model of toluene decomposition in nonequilibrium low-temperature plasma generated by a pulse-periodic discharge operating in a mixture of nitrogen and oxygen is developed. The results of numerical simulation of plasma-chemical conversion of toluene are presented; the main processes responsible for C{sub 6}H{sub 5}CH{sub 3} decomposition are identified; the contribution of each process to total removal of toluene is determined; and the intermediate and final products of C{sub 6}H{sub 5}CH{sub 3} decomposition are identified. It was shown that toluene in pure nitrogen is mostly decomposed in its reactions with metastable N{sub 2}(A{sub 3}{Sigma}{sub u}{sup +}) and N{sub 2}(a Primemore » {sup 1}{Sigma}{sub u}{sup -}) molecules. In the presence of oxygen, in the N{sub 2} : O{sub 2} gas mixture, the largest contribution to C{sub 6}H{sub 5}CH{sub 3} removal is made by the hydroxyl radical OH which is generated in this mixture exclusively due to plasma-chemical reactions between toluene and oxygen decomposition products. Numerical simulation showed the existence of an optimum oxygen concentration in the mixture, at which toluene removal is maximum at a fixed energy deposition.« less

Tailoring nanocrystalline diamond coated on titanium for osteoblast adhesion.

PubMed

Pareta, Rajesh; Yang, Lei; Kothari, Abhishek; Sirinrath, Sirivisoot; Xiao, Xingcheng; Sheldon, Brian W; Webster, Thomas J

2010-10-01

Diamond coatings with superior chemical stability, antiwear, and cytocompatibility properties have been considered for lengthening the lifetime of metallic orthopedic implants for over a decade. In this study, an attempt to tailor the surface properties of diamond films on titanium to promote osteoblast (bone forming cell) adhesion was reported. The surface properties investigated here included the size of diamond surface features, topography, wettability, and surface chemistry, all of which were controlled during microwave plasma enhanced chemical-vapor-deposition (MPCVD) processes using CH4-Ar-H2 gas mixtures. The hardness and elastic modulus of the diamond films were also determined. H2 concentration in the plasma was altered to control the crystallinity, grain size, and topography of the diamond coatings, and specific plasma gases (O2 and NH3) were introduced to change the surface chemistry of the diamond coatings. To understand the impact of the altered surface properties on osteoblast responses, cell adhesion tests were performed on the various diamond-coated titanium. The results revealed that nanocrystalline diamond (grain sizes <100 nm) coated titanium dramatically increased surface hardness, and the introduction of O2 and NH3 during the MPCVD process promoted osteoblast adhesion on diamond and, thus, should be further studied for improving orthopedic applications. Copyright 2010 Wiley Periodicals, Inc. J Biomed Mater Res Part A, 2010.

Optimization of air plasma reconversion of UF6 to UO2 based on thermodynamic calculations

NASA Astrophysics Data System (ADS)

Tundeshev, Nikolay; Karengin, Alexander; Shamanin, Igor

2018-03-01

The possibility of plasma-chemical conversion of depleted uranium-235 hexafluoride (DUHF) in air plasma in the form of gas-air mixtures with hydrogen is considered in the paper. Calculation of burning parameters of gas-air mixtures is carried out and the compositions of mixtures obtained via energy-efficient conversion of DUHF in air plasma are determined. With the help of plasma-chemical conversion, thermodynamic modeling optimal composition of UF6-H2-Air mixtures and its burning parameters, the modes for production of uranium dioxide in the condensed phase are determined. The results of the conducted researches can be used for creation of technology for plasma-chemical conversion of DUHF in the form of air-gas mixtures with hydrogen.

The effect of processing conditions on the GaAs/plasma-grown insulator interface

NASA Technical Reports Server (NTRS)

Hshieh, F. I.; Borrego, J. M.; Ghandhi, S. K.

1986-01-01

The effect of processing conditions on the interface state density was evaluated from C-V measurements on metal-oxide-semiconductor capacitors. The optimum processing conditions for the minimum surface state density was found to be related to the postoxidation annealing temperature and time, and was independent of chemical treatments prior to oxidation. Annealing at the optimum condition (i.e., at 350 C for 1 h in either nitrogen or hydrogen gas, with or without an aluminum pattern on the oxide) reduces the fast surface state density by about one order of magnitude. By using a nitrogen/oxygen plasma, the static dielectric constant of the oxide decreased as the N/O ratio was increased, and nitrogen was incorporated into the oxide. In addition, the fast surface state density was reduced as a result of this nitridation process.

High rate chemical vapor deposition of carbon films using fluorinated gases

DOEpatents

Stafford, Byron L.; Tracy, C. Edwin; Benson, David K.; Nelson, Arthur J.

1993-01-01

A high rate, low-temperature deposition of amorphous carbon films is produced by PE-CVD in the presence of a fluorinated or other halide gas. The deposition can be performed at less than 100.degree. C., including ambient room temperature, with a radio frequency plasma assisted chemical vapor deposition process. With less than 6.5 atomic percent fluorine incorporated into the amorphous carbon film, the characteristics of the carbon film, including index of refraction, mass density, optical clarity, and chemical resistance are within fifteen percent (15%) of those characteristics for pure amorphous carbon films, but the deposition rates are high.

A unifying picture of gas-phase formation and growth of PAH (Polycyclic Aromatic Hydrocarbons), soot, diamond and graphite

NASA Technical Reports Server (NTRS)

Frenklach, Michael

1990-01-01

A variety of seemingly different carbon formation processes -- polycyclic aromatic hydrocarbons and diamond in the interstellar medium, soot in hydrocarbon flames, graphite and diamond in plasma-assisted-chemical vapor deposition reactors -- may all have closely related underlying chemical reaction mechanisms. Two distinct mechanisms for gas-phase carbon growth are discussed. At high temperatures it proceeds via the formation of carbon clusters. At lower temperatures it follows a polymerization-type kinetic sequence of chemical reactions of acetylene addition to a radical, and reactivation of the resultant species through H-abstraction by a hydrogen atom.

Scalable graphene production: perspectives and challenges of plasma applications

NASA Astrophysics Data System (ADS)

Levchenko, Igor; Ostrikov, Kostya (Ken); Zheng, Jie; Li, Xingguo; Keidar, Michael; B. K. Teo, Kenneth

2016-05-01

Graphene, a newly discovered and extensively investigated material, has many unique and extraordinary properties which promise major technological advances in fields ranging from electronics to mechanical engineering and food production. Unfortunately, complex techniques and high production costs hinder commonplace applications. Scaling of existing graphene production techniques to the industrial level without compromising its properties is a current challenge. This article focuses on the perspectives and challenges of scalability, equipment, and technological perspectives of the plasma-based techniques which offer many unique possibilities for the synthesis of graphene and graphene-containing products. The plasma-based processes are amenable for scaling and could also be useful to enhance the controllability of the conventional chemical vapour deposition method and some other techniques, and to ensure a good quality of the produced graphene. We examine the unique features of the plasma-enhanced graphene production approaches, including the techniques based on inductively-coupled and arc discharges, in the context of their potential scaling to mass production following the generic scaling approaches applicable to the existing processes and systems. This work analyses a large amount of the recent literature on graphene production by various techniques and summarizes the results in a tabular form to provide a simple and convenient comparison of several available techniques. Our analysis reveals a significant potential of scalability for plasma-based technologies, based on the scaling-related process characteristics. Among other processes, a greater yield of 1 g × h-1 m-2 was reached for the arc discharge technology, whereas the other plasma-based techniques show process yields comparable to the neutral-gas based methods. Selected plasma-based techniques show lower energy consumption than in thermal CVD processes, and the ability to produce graphene flakes of various sizes reaching hundreds of square millimetres, and the thickness varying from a monolayer to 10-20 layers. Additional factors such as electrical voltage and current, not available in thermal CVD processes could potentially lead to better scalability, flexibility and control of the plasma-based processes. Advantages and disadvantages of various systems are also considered.

Scalable graphene production: perspectives and challenges of plasma applications.

PubMed

Levchenko, Igor; Ostrikov, Kostya Ken; Zheng, Jie; Li, Xingguo; Keidar, Michael; B K Teo, Kenneth

2016-05-19

Graphene, a newly discovered and extensively investigated material, has many unique and extraordinary properties which promise major technological advances in fields ranging from electronics to mechanical engineering and food production. Unfortunately, complex techniques and high production costs hinder commonplace applications. Scaling of existing graphene production techniques to the industrial level without compromising its properties is a current challenge. This article focuses on the perspectives and challenges of scalability, equipment, and technological perspectives of the plasma-based techniques which offer many unique possibilities for the synthesis of graphene and graphene-containing products. The plasma-based processes are amenable for scaling and could also be useful to enhance the controllability of the conventional chemical vapour deposition method and some other techniques, and to ensure a good quality of the produced graphene. We examine the unique features of the plasma-enhanced graphene production approaches, including the techniques based on inductively-coupled and arc discharges, in the context of their potential scaling to mass production following the generic scaling approaches applicable to the existing processes and systems. This work analyses a large amount of the recent literature on graphene production by various techniques and summarizes the results in a tabular form to provide a simple and convenient comparison of several available techniques. Our analysis reveals a significant potential of scalability for plasma-based technologies, based on the scaling-related process characteristics. Among other processes, a greater yield of 1 g × h(-1) m(-2) was reached for the arc discharge technology, whereas the other plasma-based techniques show process yields comparable to the neutral-gas based methods. Selected plasma-based techniques show lower energy consumption than in thermal CVD processes, and the ability to produce graphene flakes of various sizes reaching hundreds of square millimetres, and the thickness varying from a monolayer to 10-20 layers. Additional factors such as electrical voltage and current, not available in thermal CVD processes could potentially lead to better scalability, flexibility and control of the plasma-based processes. Advantages and disadvantages of various systems are also considered.

Plasma and collision processes of hypervelocity meteorite impact in the prehistory of life

NASA Astrophysics Data System (ADS)

Managadze, G.

2010-07-01

A new concept is proposed, according to which the plasma and collision processes accompanying hypervelocity impacts of meteorites can contribute to the arising of the conditions on early Earth, which are necessary for the appearance of primary forms of living matter. It was shown that the processes necessary for the emergence of living matter could have started in a plasma torch of meteorite impact and have continued in an impact crater in the case of the arising of the simplest life form. It is generally accepted that planets are the optimal place for the origin and evolution of life. In the process of forming the planetary systems the meteorites, space bodies feeding planet growth, appear around stars. In the process of Earth's formation, meteorite sizes ranged from hundreds and thousands of kilometres. These space bodies consisted mostly of the planetesimals and comet nucleus. During acceleration in Earth's gravitational field they reached hypervelocity and, hitting the surface of planet, generated powerful blowouts of hot plasma in the form of a torch. They also created giant-size craters and dense dust clouds. These bodies were composed of all elements needed for the synthesis of organic compounds, with the content of carbon being up to 5%-15%. A new idea of possible synthesis of the complex organic compounds in the hypervelocity impact-generated plasma torch was proposed and experimentally confirmed. A previously unknown and experimentally corroborated feature of the impact-generated plasma torch allowed a new concept of the prehistory of life to be developed. According to this concept the intensive synthesis of complex organic compounds arose during meteoritic bombardment in the first 0.5 billion years at the stage of the planet's formation. This most powerful and destructive action in Earth's history could have played a key role and prepared conditions for the origin of life. In the interstellar gas-dust clouds, the synthesis of simple organic matter could have been explained by an identical process occurring in the plasma torch of hypervelocity collisions between submicron size dust particles. It is assumed that the processes occurred in the highly unbalanced hot plasma simultaneously with the synthesis of simple and complicated organic compounds, thereby ensuring their ordering and assembly. Bona fide experimental evidence presented below indicates that the physical fields generated in the plasma environment in the process of the formation and expansion of the torch meet the main requirements toward “true” local chiral fields. These fields were very likely to be capable to trigger the initial, weak breaking of enantiomer symmetry and determine the “sign” of the asymmetry of the bioorganic world. These fields could have worked as “trapping” fields influencing spontaneous processes occurring in highly overheated and nonequilibrium plasma in the state that is far from the thermodynamical branch of equilibrium and may have contributed to the formation of an environment needed for the synthesis of homochiral molecular structures, which, in turn, were needed for the emergence of the primary forms of living matter. It has been shown experimentally that the plasma-chemical processes in the torch have high catalytic properties and assure the rise of the chemical reaction rates by 10-100 million times. In the process of the plasma flyaway this in turn can assure the fast formation of simple and complicated organic compounds, including hyper-branched polymers. It is possible to assume that predominantly inorganic substances from meteorites were used for the synthesis of complicated organic compounds on early Earth. A laboratory experiment with hypervelocity impact plasma torch modelling by a laser with a Q-switch mode has shown the possibility of high-molecular organic compound synthesis, with mass of approximately 5000 a.m.u. by meteorite impact with an effective diameter of 100 mkm. The target contained only H, C, N and O elements in inorganic forms. The approximation of the curve received in these experiments has shown that molecular structures comparable in mass with the protoviroid (a hypothetical primogenitor of the biosphere) and could have been synthesized as a result of the impact of a meteorite of a millimetre-size range. Observable characteristics of the synthesis processes suggest high catalytic activity of the plasma medium and high speed of plasma-chemical reactions, combined with ordering and assemblage processes. This suggests that the plasma torch with a huge local density of energy and matter may be the optimal medium for the synthesis of complex organic compounds needed for prebiotic evolution and the development of the primary form of living matter. A new view of the impact crater provides the most interesting and unexpected consequence of the concept proposed. When considering the problem, it became evident that at a prebiotic stage of evolution there should be an environment in which a photogenic creature could have survived. The crater of the meteoric impact, which is capable of producing ‘a primogenitor of the biosphere’ environment sated with organic matter, moderate temperature and water for considerable time and becoming ‘a life cradle’, appears to be such an environment. Having enormous energy, the meteorite impact is capable of injecting the newly created complicated organic compounds deep into the space body surfaces, including subsurface water reservoirs, such as Europe, Enchilada and Titan. In this case the meteorite impact has no natural alternative in the creation of initial conditions for the origin of extraterrestrial life. This possibility was confirmed by a laboratory impact model experiment, in which the plasma torch was created under the water surface. The concept proposed is based on physical processes occurring in nature and on experimental results of impact experiments and subsequent modelling of their analogues in laboratory conditions. Thus, the realizability and survivability of this concept should be taken as well grounded due to the simplicity and clarity of the physical processes.

Review Article: Unraveling synergistic effects in plasma-surface processes by means of beam experiments

PubMed Central

von Keudell, Achim; Corbella, Carles

2017-01-01

The interaction of plasmas with surfaces is dominated by synergistic effects between incident ions and radicals. Film growth is accelerated by the ions, providing adsorption sites for incoming radicals. Chemical etching is accelerated by incident ions when chemical etching products are removed from the surface by ion sputtering. The latter is the essence of anisotropic etching in microelectronics, as elucidated by the seminal paper of Coburn and Winters [J. Appl. Phys. 50, 3189 (1979)]. However, ion-radical-synergisms play also an important role in a multitude of other systems, which are described in this article: (1) hydrocarbon thin film growth from methyl radicals and hydrogen atoms; (2) hydrocarbon thin film etching by ions and reactive neutrals; (3) plasma inactivation of bacteria; (4) plasma treatment of polymers; and (5) oxidation mechanisms during reactive magnetron sputtering of metal targets. All these mechanisms are unraveled by using a particle beam experiment to mimic the plasma–surface interface with the advantage of being able to control the species fluxes independently. It clearly shows that the mechanisms in action that had been described by Coburn and Winters [J. Appl. Phys. 50, 3189 (1979)] are ubiquitous. PMID:29104360

Magnetic Flux Compression Reactor Concepts for Spacecraft Propulsion and Power (MSFC Center Director's Discretionary Fund; Project No. 99-24). Part 1

NASA Technical Reports Server (NTRS)

Litchford, R. J.; Robertson, G. A.; Hawk, C. W.; Turner, M. W.; Koelfgen, S.; Litchford, Ron J. (Technical Monitor)

2001-01-01

This technical publication (TP) examines performance and design issues associated with magnetic flux compression reactor concepts for nuclear/chemical pulse propulsion and power. Assuming that low-yield microfusion detonations or chemical detonations using high-energy density matter can eventually be realized in practice, various magnetic flux compression concepts are conceivable. In particular, reactors in which a magnetic field would be compressed between an expanding detonation-driven plasma cloud and a stationary structure formed from a high-temperature superconductor are envisioned. Primary interest is accomplishing two important functions: (1) Collimation and reflection of a hot diamagnetic plasma for direct thrust production, and (2) electric power generation for fusion standoff drivers and/or dense plasma formation. In this TP, performance potential is examined, major technical uncertainties related to this concept accessed, and a simple performance model for a radial-mode reactor developed. Flux trapping effectiveness is analyzed using a skin layer methodology, which accounts for magnetic diffusion losses into the plasma armature and the stationary stator. The results of laboratory-scale experiments on magnetic diffusion in bulk-processed type II superconductors are also presented.

Collisional considerations in axial-collection plasma mass filters

DOE Office of Scientific and Technical Information (OSTI.GOV)

Ochs, I. E.; Gueroult, R.; Fisch, N. J.

The chemical inhomogeneity of nuclear waste makes chemical separations difficult, while the correlation between radioactivity and nuclear mass makes mass-based separation, and in particular plasma-based separation, an attractive alternative. Here, we examine a particular class of plasma mass filters, namely filters in which (a) species of different masses are collected along magnetic field lines at opposite ends of an open-field-line plasma device and (b) gyro-drift effects are important for the separation process. Using an idealized cylindrical model, we derive a set of dimensionless parameters which provide minimum necessary conditions for an effective mass filter function in the presence of ion-ionmore » and ion-neutral collisions. Through simulations of the constant-density profile, turbulence-free devices, we find that these parameters accurately describe the mass filter performance in more general magnetic geometries. We then use these parameters to study the design and upgrade of current experiments, as well as to derive general scalings for the throughput of production mass filters. Most importantly, we find that ion temperatures above 3 eV and magnetic fields above 104 G are critical to ensure a feasible mass filter function when operating at an ion density of 10 13 cm –3.« less

Collisional considerations in axial-collection plasma mass filters

DOE PAGES

Ochs, I. E.; Gueroult, R.; Fisch, N. J.; ...

2017-04-01

The chemical inhomogeneity of nuclear waste makes chemical separations difficult, while the correlation between radioactivity and nuclear mass makes mass-based separation, and in particular plasma-based separation, an attractive alternative. Here, we examine a particular class of plasma mass filters, namely filters in which (a) species of different masses are collected along magnetic field lines at opposite ends of an open-field-line plasma device and (b) gyro-drift effects are important for the separation process. Using an idealized cylindrical model, we derive a set of dimensionless parameters which provide minimum necessary conditions for an effective mass filter function in the presence of ion-ionmore » and ion-neutral collisions. Through simulations of the constant-density profile, turbulence-free devices, we find that these parameters accurately describe the mass filter performance in more general magnetic geometries. We then use these parameters to study the design and upgrade of current experiments, as well as to derive general scalings for the throughput of production mass filters. Most importantly, we find that ion temperatures above 3 eV and magnetic fields above 104 G are critical to ensure a feasible mass filter function when operating at an ion density of 10 13 cm –3.« less

Low-temperature graphene synthesis using microwave plasma CVD

NASA Astrophysics Data System (ADS)

Yamada, Takatoshi; Kim, Jaeho; Ishihara, Masatou; Hasegawa, Masataka

2013-02-01

The graphene chemical vapour deposition (CVD) technique at substrate temperatures around 300 °C by a microwave plasma sustained by surface waves (surface wave plasma chemical vapour deposition, SWP-CVD) is discussed. A low-temperature, large-area and high-deposition-rate CVD process for graphene films was developed. It was found from Raman spectra that the deposited films on copper (Cu) substrates consisted of high-quality graphene flakes. The fabricated graphene transparent conductive electrode showed uniform optical transmittance and sheet resistance, which suggests the possibility of graphene for practical electrical and optoelectronic applications. It is intriguing that graphene was successfully deposited on aluminium (Al) substrates, for which we did not expect the catalytic effect to decompose hydrocarbon and hydrogen molecules. We developed a roll-to-roll SWP-CVD system for continuous graphene film deposition towards industrial mass production. A pair of winder and unwinder systems of Cu film was installed in the plasma CVD apparatus. Uniform Raman spectra were confirmed over the whole width of 297 mm of Cu films. We successfully transferred the deposited graphene onto PET films, and confirmed a transmittance of about 95% and a sheet resistance of less than 7 × 105 Ω/sq.

Atmospheric pressure plasma jet for bacterial decontamination and property improvement of fruit and vegetable processing wastewater

NASA Astrophysics Data System (ADS)

Mohamed, Abdel-Aleam H.; Shariff, Samir M. Al; Ouf, Salama A.; Benghanem, Mohamed

2016-05-01

An atmospheric pressure plasma jet was tested for decontaminating and improving the characteristics of wastewater derived from blackberry, date palm, tomato and beetroot processing industries. The jet was generated by blowing argon gas through a cylindrical alumina tube while a high voltage was applied between two electrodes surrounding the tube. Oxygen gas was mixed with argon at the rate of 0.2% and the argon mass flow was fixed at 4.5 slm. Images show that the generated plasma jet penetrated the treated wastewater samples. Plasma emission spectra show the presence of O and OH radicals as well as excited molecular nitrogen and argon. Complete decontamination of wastewater derived from date palm and tomato processing was achieved after 120 and 150 s exposure to the plasma jet, respectively. The bacterial count of wastewater from blackberry and beetroot was reduced by 0.41 and 2.24 log10 colony-forming units (CFU) per ml, respectively, after 180 s. Escherichia coli was the most susceptible bacterial species to the cold plasma while Shigella boydii had the minimum susceptibility, recording 1.30 and 3.34 log10 CFU ml-1, respectively, as compared to the 7.00 log10 initial count. The chemical oxygen demands of wastewater were improved by 57.5-93.3% after 180 s exposure to the plasma jet being tested. The endotoxins in the wastewater were reduced by up to 90.22%. The variation in plasma effectiveness is probably related to the antioxidant concentration of the different investigated wastewaters.

High-Throughput Top-Down and Bottom-Up Processes for Forming Single-Nanotube Based Architectures for 3D Electronics

NASA Technical Reports Server (NTRS)

Kaul, Anupama B.; Megerian, Krikor G.; von Allmen, Paul; Kowalczyk, Robert; Baron, Richard

2009-01-01

We have developed manufacturable approaches to form single, vertically aligned carbon nanotubes, where the tubes are centered precisely, and placed within a few hundred nm of 1-1.5 micron deep trenches. These wafer-scale approaches were enabled by chemically amplified resists and inductively coupled Cryo-etchers for forming the 3D nanoscale architectures. The tube growth was performed using dc plasma-enhanced chemical vapor deposition (PECVD), and the materials used for the pre-fabricated 3D architectures were chemically and structurally compatible with the high temperature (700 C) PECVD synthesis of our tubes, in an ammonia and acetylene ambient. Tube characteristics were also engineered to some extent, by adjusting growth parameters, such as Ni catalyst thickness, pressure and plasma power during growth. Such scalable, high throughput top-down fabrication techniques, combined with bottom-up tube synthesis, should accelerate the development of PECVD tubes for applications such as interconnects, nano-electromechanical (NEMS), sensors or 3D electronics in general.

Physicochemical processes in the indirect interaction between surface air plasma and deionized water

NASA Astrophysics Data System (ADS)

Liu, Z. C.; Liu, D. X.; Chen, C.; Li, D.; Yang, A. J.; Rong, M. Z.; Chen, H. L.; Kong, M. G.

2015-12-01

One of the most central scientific questions for plasma applications in healthcare and environmental remediation is the chemical identity and the dose profile of plasma-induced reactive oxygen and nitrogen species (ROS/RNS) that can act on an object inside a liquid. A logical focus is on aqueous physicochemical processes near a sample with a direct link to their upstream gaseous processes in the plasma region and a separation gap from the liquid bulk. Here, a system-level modeling framework is developed for indirect interactions of surface air plasma and a deionized water bulk and its predictions are found to be in good agreement with the measurement of gas-phase ozone and aqueous long-living ROS/RNS concentrations. The plasma region is described with a global model, whereas the air gap and the liquid region are simulated with a 1D fluid model. All three regions are treated as one integrated entity and computed simultaneously. With experimental validation, the system-level modeling shows that the dominant aqueous ROS/RNS are long-living species (e.g. H2O2 aq, O3 aq, nitrite/nitrate, H+ aq). While most short-living gaseous species could hardly survive their passage to the liquid, aqueous short-living ROS/RNS are generated in situ through reactions among long-living plasma species and with water molecules. This plasma-mediated remote production of aqueous ROS/RNS is important for the abundance of aqueous HO2 aq, HO3 aq, OHaq and \\text{O}2- aq as well as NO2 aq and NO3 aq. Aqueous plasma chemistry offers a novel and significant pathway to activate a given biological outcome, as exemplified here for bacterial deactivation in plasma-activated water. Additional factors that may synergistically broaden the usefulness of aqueous plasma chemistry include an electric field by aqueous ions and liquid acidification. The system-modeling framework will be useful in assisting designs and analyses of future investigations of plasma-liquid and plasma-cell interactions.

Optical Sensor for real-time Monitoring of CO(2) Laser Welding Process.

PubMed

Ancona, A; Spagnolo, V; Lugarà, P M; Ferrara, M

2001-11-20

An optical sensor for real-time monitoring of laser welding based on a spectroscopic study of the optical emission of plasma plumes has been developed. The welding plasma's electron temperature was contemporarily monitored for three of the chemical species that constitute the plasma plume by use of related emission lines. The evolution of electron temperature was recorded and analyzed during several welding procedures carried out under various operating conditions. A clear correlation between the mean value and the standard deviation of the plasma's electron temperature and the quality of the welded joint has been found. We used this information to find optimal welding parameters and for real-time detection of weld defects such as crater formation, lack of penetration, weld disruptions, and seam oxidation.

Experimental Study on the Plasma Purification for Diesel Engine Exhaust Gas

NASA Astrophysics Data System (ADS)

Chen, Jing; Zu, Kan; Wang, Mei

2018-02-01

It is known that the use of ternary catalysis is capable of significantly reducing the emission of pollutants from petrol vehicles. However, the disadvantages such as the temperature and other limitations make it unsuitable for diesel engines. The plasma-assisted catalyst technology has been applied in dealing with the diesel exhaust in the experiment in order to do further research on the effects of plasma in exhaust processing. The paper not only includes the experimental observation on the change of particle concentration after the operation of purification device, but also builds the kinetic model of chemical reactions to simulate the reactions of nitrogen oxides in plasma through using the software of Matlab, then compares the calculation results with experimental samples and finally gets some useful conclusions in practice.

Martian Dust Devil Electron Avalanche Process and Associated Electrochemistry

NASA Technical Reports Server (NTRS)

Jackson, Telana L.; Farrell, William M.; Delory, Gregory T.; Nithianandam, Jeyasingh

2010-01-01

Mars' dynamic atmosphere displays localized dust devils and larger, global dust storms. Based on terrestrial analog studies, electrostatic modeling, and laboratory work these features will contain large electrostatic fields formed via triboelectric processes. In the low-pressure Martian atmosphere, these fields may create an electron avalanche and collisional plasma due to an increase in electron density driven by the internal electrical forces. To test the hypothesis that an electron avalanche is sustained under these conditions, a self-consistent atmospheric process model is created including electron impact ionization sources and electron losses via dust absorption, electron dissociation attachment, and electron/ion recombination. This new model is called the Dust Devil Electron Avalanche Model (DDEAM). This model solves simultaneously nine continuity equations describing the evolution of the primary gaseous chemical species involved in the electrochemistry. DDEAM monitors the evolution of the electrons and primary gas constituents, including electron/water interactions. We especially focus on electron dynamics and follow the electrons as they evolve in the E field driven collisional gas. When sources and losses are self-consistently included in the electron continuity equation, the electron density grows exponentially with increasing electric field, reaching an equilibrium that forms a sustained time-stable collisional plasma. However, the character of this plasma differs depending upon the assumed growth rate saturation process (chemical saturation versus space charge). DDEAM also shows the possibility of the loss of atmospheric methane as a function of electric field due to electron dissociative attachment of the hydrocarbon. The methane destruction rates are presented and can be included in other larger atmospheric models.

Harnessing of radio frequency discharge for production of biologically compatible coatings for ophthalmology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Abdullin, I.Sh.; Bragin, V.E.; Bykanov, A.N.

Gas discharge plasma modification of polymer materials and metals is one of the known physical approaches for improving of materials biocompatibility in ophthalmology and surgery. The surface treatment in RF discharges can be effectively realized in the discharge afterglow and in the discharge region itself too. This modification method is more convenient and produces more uniform surfaces in comparison with other discharge types. The carried out experiments and published up to now results show that interaction of UV radiation, fluxes of ions, electrons and metastable particles with material`s surface changes chemical composition and surface structure. The exerting of these agentsmore » on the sample surface produces the following effects. There are processes of physical and plasma-chemical surface etching producing effective surface cleaning of different types of contaminations. It may be surface contaminations by hydrocarbons because of preliminary surface contacts with biological or physical bodies. It may be surface contaminations caused by characteristic properties of chemical technology too. There is a surface layer with thickness from some angstroms up to few hundreds of angstroms. The chemical content and structure of this layer is distinguished from the bulk polymer properties. The presence of such {open_quotes}technological{close_quotes} contaminations produces the layer of material substantially differing from the base polymer. The basic layer physical and chemical properties for example, gas permeation rate may substantially differ from the base polymer. Attempts to clean the surface from these contaminations by chemical methods (solutions) have not been successful and produced contaminations of more deep polymer layers. So the plasma cleaning is the most profitable method of polymer treatment for removing the surface contaminations. The improving of wettability occurs during this stage of treatment.« less

Kinetic mechanism of molecular energy transfer and chemical reactions in low-temperature air-fuel plasmas.

PubMed

Adamovich, Igor V; Li, Ting; Lempert, Walter R

2015-08-13

This work describes the kinetic mechanism of coupled molecular energy transfer and chemical reactions in low-temperature air, H2-air and hydrocarbon-air plasmas sustained by nanosecond pulse discharges (single-pulse or repetitive pulse burst). The model incorporates electron impact processes, state-specific N(2) vibrational energy transfer, reactions of excited electronic species of N(2), O(2), N and O, and 'conventional' chemical reactions (Konnov mechanism). Effects of diffusion and conduction heat transfer, energy coupled to the cathode layer and gasdynamic compression/expansion are incorporated as quasi-zero-dimensional corrections. The model is exercised using a combination of freeware (Bolsig+) and commercial software (ChemKin-Pro). The model predictions are validated using time-resolved measurements of temperature and N(2) vibrational level populations in nanosecond pulse discharges in air in plane-to-plane and sphere-to-sphere geometry; temperature and OH number density after nanosecond pulse burst discharges in lean H(2)-air, CH(4)-air and C(2)H(4)-air mixtures; and temperature after the nanosecond pulse discharge burst during plasma-assisted ignition of lean H2-mixtures, showing good agreement with the data. The model predictions for OH number density in lean C(3)H(8)-air mixtures differ from the experimental results, over-predicting its absolute value and failing to predict transient OH rise and decay after the discharge burst. The agreement with the data for C(3)H(8)-air is improved considerably if a different conventional hydrocarbon chemistry reaction set (LLNL methane-n-butane flame mechanism) is used. The results of mechanism validation demonstrate its applicability for analysis of plasma chemical oxidation and ignition of low-temperature H(2)-air, CH(4)-air and C(2)H(4)-air mixtures using nanosecond pulse discharges. Kinetic modelling of low-temperature plasma excited propane-air mixtures demonstrates the need for development of a more accurate 'conventional' chemistry mechanism. © 2015 The Author(s) Published by the Royal Society. All rights reserved.

Comparative analysis of polychlorinated biphenyl decomposition processes in air or argon (+oxygen) thermal plasma.

PubMed

Kostic, Z G; Stefanovic, P L; Pavlović, P B

2000-07-10

Thermal plasmas may solve one of the biggest toxic waste disposal problems. The disposal of polychlorinated biphenyls (PCBs) is a long standing problem which will get worse in the coming years, when 180000 tons of PCB-containing wastes are expected to accumulate in Europe (Hot ions break down toxic chemicals, New Scientist, 16 April 1987, p. 24.). The combustion of PCBs in ordinary incinerators (at temperature T approximately 1100 K, as measured near the inner wall of the combustion chamber (European Parliament and Council Directive on Incineration of Waste (COM/99/330), Europe energy, 543, Sept. 17, 1999, 1-23.)) can cause more problems than it solves, because highly toxic dioxins and dibenzofurans are formed if the combustion temperature is too low (T<1400 K). The paper presents a thermodynamic consideration and comparative analysis of PCB decomposition processes in air or argon (+oxygen) thermal plasmas.

High density gold nanoparticles immobilized on surface via plasma deposited APTES film for decomposing organic compounds in microchannels

NASA Astrophysics Data System (ADS)

Rao, Xi; Guyon, Cédric; Ognier, Stephanie; Da Silva, Bradley; Chu, Chenglin; Tatoulian, Michaël; Hassan, Ali Abou

2018-05-01

Immobilization of colloidal particles (e.g. gold nanoparticles (AuNps)) on the inner surface of micro-/nano- channels has received a great interest for catalysis. A novel catalytic ozonation setup using a gold-immobilized microchannel reactor was developed in this work. To anchor AuNps, (3-aminopropyl) triethoxysilane (APTES) with functional amine groups was deposited using plasma enhanced chemical vapor deposition (PECVD) process. The results clearly evidenced that PECVD processing exhibited relatively high efficiency for grafting amine groups and further immobilizing AuNPs. The catalytic activity of gold immobilized microchannel was evaluated by pyruvic acid ozonation. The decomposition rate calculated from High Performance Liquid Chromatography (HPLC) indicated a much better catalytic performance of gold in microchannel than that in batch. The results confirmed immobilizing gold nanoparticles on plasma deposited APTES for preparing catalytic microreactors is promising for the wastewater treatment in the future.

Effect of glow DBD modulation on gas and thin film chemical composition: case of Ar/SiH4/NH3 mixture

NASA Astrophysics Data System (ADS)

Vallade, Julien; Bazinette, Remy; Gaudy, Laura; Massines, Françoise

2014-06-01

In recent years, atmospheric pressure plasma-enhanced chemical vapour deposition has been identified as a convenient way to deposit good quality thin films. With this type of process, where the gas mixture is injected on one side of the electrodes, the chemical composition of the gas evolves with the gas residence time in the plasma. The consequence is a possible gradient in the chemical composition over the thickness of in-line coatings. The present work shows that the modulation of the plasma with a square signal significantly reduces this gradient while the drawback of low growth rate is avoided by increasing the discharge power. This study deals with plane/plane glow dielectric barrier discharges (DBDs) in an Ar/NH3/SiH4 gas mixture to make thin films. The 50 kHz discharge power of the glow DBD was varied by increasing voltage and modulating excitation. The impact on (i) the plasma development was observed through emission spectroscopy and (ii) the thin film coating through Fourier transform infrared measurements. It is shown that the modulation significantly decreases the time and the energy needed to achieve stable chemistry, enhances secondary chemistry and limits disturbance induced by impurities because of a slower decrease of SiH4 concentration and thus a higher ratio of SiH4/impurities, all very important points for in-line AP-PECVD development. When the growth rate is limited by diffusion, coating growth continues when the discharge is off, so long as there is a precursor gradient between the surface and the gas bulk. A higher discharge power steepens this gradient, which enhances diffusion from the bulk and thus growth rate.

Fundamental processes in the expansion, energization, and coupling of single- and multi-Ion plasmas in space: Laboratory simulation experiments

NASA Technical Reports Server (NTRS)

Szuszczewicz, E. P.; Bateman, T. T.

1996-01-01

We have conducted a laboratory investigation into the physics of plasma expansions and their associated energization processes. We studied single- and multi-ion plasma processes in self-expansions, and included light and heavy ions and heavy/light mixtures to encompass the phenomenological regimes of the solar and polar winds and the AMPTE and CRRES chemical release programs. The laboratory experiments provided spatially-distributed time-dependent measurements of total plasma density, temperature, and density fluctuation power spectra with the data confirming the long-theorized electron energization process in an expanding cloud - a result that was impossible to determine in spaceborne experiments (as e.g., in the CRRES program). These results provided the missing link in previous laboratory and spaceborne programs. confirming important elements in our understanding of such solar-terrestrial processes as manifested in expanding plasmas in the solar wind (e.g., CMES) and in ionospheric outflow in plasmaspheric fluctuate refilling after a storm. The energization signatures were seen in an entire series of runs that varied the ion species (Ar', Xe', Kr' and Ne'), and correlative studies included spectral analyses of electrostatic waves collocated with the energized electron distributions. In all cases wave energies were most intense during the times in which the suprathermal populations were present, with wave intensity increasing with the intensity of the suprathermal electron population. This is consistent with theoretical expectations wherein the energization process is directly attributable to wave particle interactions. No resonance conditions were observed, in an overall framework in which the general wave characteristics were broadband with power decreasing with increasing frequency.

Novel Cyclosilazane-Type Silicon Precursor and Two-Step Plasma for Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride.

PubMed

Park, Jae-Min; Jang, Se Jin; Lee, Sang-Ick; Lee, Won-Jun

2018-03-14

We designed cyclosilazane-type silicon precursors and proposed a three-step plasma-enhanced atomic layer deposition (PEALD) process to prepare silicon nitride films with high quality and excellent step coverage. The cyclosilazane-type precursor, 1,3-di-isopropylamino-2,4-dimethylcyclosilazane (CSN-2), has a closed ring structure for good thermal stability and high reactivity. CSN-2 showed thermal stability up to 450 °C and a sufficient vapor pressure of 4 Torr at 60 °C. The energy for the chemisorption of CSN-2 on the undercoordinated silicon nitride surface as calculated by density functional theory method was -7.38 eV. The PEALD process window was between 200 and 500 °C, with a growth rate of 0.43 Å/cycle. The best film quality was obtained at 500 °C, with hydrogen impurity of ∼7 atom %, oxygen impurity less than 2 atom %, low wet etching rate, and excellent step coverage of ∼95%. At 300 °C and lower temperatures, the wet etching rate was high especially at the lower sidewall of the trench pattern. We introduced the three-step PEALD process to improve the film quality and the step coverage on the lower sidewall. The sequence of the three-step PEALD process consists of the CSN-2 feeding step, the NH 3 /N 2 plasma step, and the N 2 plasma step. The H radicals in NH 3 /N 2 plasma efficiently remove the ligands from the precursor, and the N 2 plasma after the NH 3 plasma removes the surface hydrogen atoms to activate the adsorption of the precursor. The films deposited at 300 °C using the novel precursor and the three-step PEALD process showed a significantly improved step coverage of ∼95% and an excellent wet etching resistance at the lower sidewall, which is only twice as high as that of the blanket film prepared by low-pressure chemical vapor deposition.

Decomposition of toluene in a steady-state atmospheric-pressure glow discharge

DOE Office of Scientific and Technical Information (OSTI.GOV)

Trushkin, A. N.; Grushin, M. E.; Kochetov, I. V.

Results are presented from experimental studies of decomposition of toluene (C{sub 6}H{sub 5}CH{sub 3}) in a polluted air flow by means of a steady-state atmospheric pressure glow discharge at different water vapor contents in the working gas. The experimental results on the degree of C{sub 6}H{sub 5}CH{sub 3} removal are compared with the results of computer simulations conducted in the framework of the developed kinetic model of plasma chemical decomposition of toluene in the N{sub 2}: O{sub 2}: H{sub 2}O gas mixture. A substantial influence of the gas flow humidity on toluene decomposition in the atmospheric pressure glow discharge ismore » demonstrated. The main mechanisms of the influence of humidity on C{sub 6}H{sub 5}CH{sub 3} decomposition are determined. The existence of two stages in the process of toluene removal, which differ in their duration and the intensity of plasma chemical decomposition of C{sub 6}H{sub 5}CH{sub 3} is established. Based on the results of computer simulations, the composition of the products of plasma chemical reactions at the output of the reactor is analyzed as a function of the specific energy deposition and gas flow humidity. The existence of a catalytic cycle in which hydroxyl radical OH acts a catalyst and which substantially accelerates the recombination of oxygen atoms and suppression of ozone generation when the plasma-forming gas contains water vapor is established.« less

Research of a possibility of receiving sorbents for a sewage disposal from a wastage of coal preparation factory

NASA Astrophysics Data System (ADS)

Buyantuev, S. L.; Kondratenko, A. S.; Shishulkin, S. Y.; Stebenkova, Y. Y.; Khmelev, A. B.

2017-05-01

The paper presents the results of the studies of the structure and porosity of the coal cake processed by electric arc plasma. The main limiting factor in processing of coal cakes sorbents is their high water content. As a result of coal washing, the main share of water introduced into the cake falls on hard-hydrate and colloidal components. This makes impossible application of traditional processes of manufacturing from a cake of coal sorbents. Using the electric arc intensifies the processes of thermal activation of coal cakes associated with thermal shock, destruction and vapor-gas reactions occurring at the surfaces of the particles at an exposure temperature of up to 3000 °C, which increases the title product outlet (sorbent) and thereby reduces manufacturing costs and improves environmental performance. The investigation of the thermal activation zone is carried out in the plasma reactor chamber by thermal imaging method followed by mapping-and 3D-modeling of temperature fields. the most important physical and chemical properties of the sorbents from coal cake activated by plasma was studied. The obtained results showed the possibility of coal cake thermal activation by electric arc plasma to change its material composition, the appearance of porosity and associated sorption capacity applied for wastewater treatment.

Pulsed discharge plasma induced Fenton-like reactions for the enhancement of the degradation of 4-chlorophenol in water.

PubMed

Hao, Xiaolong; Zhou, Minghua; Xin, Qing; Lei, Lecheng

2007-02-01

To sufficiently utilize chemically active species and enhance the degradation rate and removal efficiency of toxic and biorefractory organic pollutant para-chlorophenol (para-CP), the introductions of iron metal ions (Fe2+/Fe3+) into either pulsed discharge plasma (PDP) process or the PDP process with TiO2 photo-catalyst were tentatively performed. The experimental results showed that under the same experimental condition, the degradation rate and removal efficiency of para-CP were greatly enhanced by the introduction of iron ions (Fe2+/Fe3+) into the PDP process. Moreover, when iron ions and TiO2 were added together in the PDP process, the degradation rate and removal energy of para-CP further improved. The possible mechanism was discussed that the obvious promoting effects were attributed to ferrous ions via plasma induced Fenton-like reactions by UV light irradiation excited and hydrogen peroxide formed in pulsed electrical discharge, resulting in a larger amount of hydroxyl radicals produced from the residual hydrogen peroxide. In addition, the regeneration of ferric ions to ferrous ions facilitates the progress of plasma induced Fenton-like reactions by photo-catalytic reduction of UV light, photo-catalytic reduction on TiO2 surface and electron transfer of quinone intermediates, i.e. 1,4-hydroquinone and 1,4-benzoquinone.

Effectiveness of plasma and radical control for the low temperature synthesis and properties of a-SiNx:H films using RF-near microwave PECVD

NASA Astrophysics Data System (ADS)

Sahu, Bibhuti Bhusan; Toyoda, Hirotaka; Han, Jeon Geon

2018-02-01

By mixing and alternating power conditions of radio frequency and microwave plasma sources, a detailed study of a-SiNx:H films in the SiH4/N2 plasma enhanced chemical vapour deposition processes is undertaken. Data reveal a remarkable coherence between the deposition conditions, material's quality, bond densities, optical property, and stoichiometry of the films. The film composition can simply vary from Si-rich to N-rich by incorporating suitable plasma and atomic radical parameters. Highly transparent and wide bandgap films with N to Si and N to H atomic ratios up to ˜2.3 and 3.1, respectively, are prepared by controlling the plasma parameters and radicals. The presented results pave the way for dual frequency PECVD utilization in a-SiNx:H films for their use in controlled-bandgap nanodevices and light emitting applications.

Effects of humidity on sterilization of Geobacillus stearothermophilus spores with plasma-excited neutral gas

NASA Astrophysics Data System (ADS)

Matsui, Kei; Ikenaga, Noriaki; Sakudo, Noriyuki

2015-06-01

We investigate the effects of relative humidity on the sterilization process using a plasma-excited neutral gas that uniformly sterilizes both the space and inner wall of the reactor chamber at atmospheric pressure. Only reactive neutral species such as plasma-excited gas molecules and radicals were separated from the plasma and sent to the reactor chamber for chemical sterilization. The plasma source gas is nitrogen mixed with 0.1% oxygen, and the relative humidity in the source gas is controlled by changing the mixing ratio of water vapor. The relative humidity near the sample in the reactor chamber is controlled by changing the sample temperature. As a result, the relative humidity near the sample should be kept in the range from 60 to 90% for the sterilization of Geobacillus stearothermophilus spores. When the relative humidity in the source gas increases from 30 to 90%, the sterilization effect is enhanced by the same degree.

Properties of zirconia after plasma treatment

NASA Astrophysics Data System (ADS)

Alekseenko, V. P.; Kulkov, S. N.

2017-09-01

The influence of high-frequency plasma treatment on the properties of zirconia powder is shown in the work. The powder was produced by a plasma-chemical method. The powders had a foamy form with the size of agglomerates of 5-10 μm and crystallites of 20-50 nm. The powders were treated by the pulse plasma unit with dielectric barrier discharge generator. It was shown that the plasma processing changes the acidity of water-powder suspensions from 8.1 to 4.3 pH, which signifies the powders' wettability improvement. It was revealed that more intensive mixing using ultrasound influences the acidity level, reducing it in comparison with mixing by paddle-type agitator. It was shown that these changes of surface properties have relaxation by 4% per day and extrapolation of this dependence shows that the powder will have initial properties after 400 hours storage at room conditions.

Numerical study of heating and evaporation processes of quartz particles in RF inductively coupled plasma

NASA Astrophysics Data System (ADS)

Grishin, Yu M.; Miao, Long

2017-05-01

Numerical simulations of heat and evaporation processes of quartz particles in Ar radio frequency inductively coupled plasma (ICP) are investigated. The quartz particles are supplied by the carrier gas into the ICP within gas-cooling. It is shown that with the increase of amplitude of discharge current above critical value there is a toroidal vortex in the ICP torch at the first coil. The conditions for the formation of vortex and the parameters of the vortex tube have been evaluated and determined. The influence of vortex, discharge current, coil numbers and feed rate of carrier gas on the evaporation efficiency of quartz particles have been demonstrated. It was found that the optimal discharge current is close to the critical value when the quartz particles with initial sizes up to 130 μm can be fully vaporized in the ICP torch with thermal power of 10kW. The heat and evaporation processes of quartz particles in the ICP torch have significant importance for the study of one-step plasma chemical reaction method directly producing silicon from silicide (SiO2) in the argon-hydrogen plasma.

USU Center of Excellence in Theory and Analysis of the Geo-Plasma Environment

DTIC Science & Technology

1992-05-25

AFM CN AOR9002 B. ADORE=S ICRYi. Stei md ZIP Codej 10. SOURCE OF FUNOING NOS. BuildPng 410 PROGRAM PROJECT TASK WORK UNIT.- Buling 410D..203 ELEMENT ...OTH radars, communications, and orbiting space structures. The overall goal of the research is to obtain a better understanding of the basic chemical...and orbiting space structures. The overall goal of the research is to obtain a better understanding of the basic chemical and physical processes

Study of effective utilization of iron ore sinter through arc plasma

NASA Astrophysics Data System (ADS)

Swain, Biswajit; Samal, S. K.; Mohanty, M. K.; Behera, A.; Mishra, S. C.

2018-03-01

Generation of fines is common in mining, sizing, and beneficiation and also in high-temperature metallurgical processes as the disintegration of agglomerate/compact occurs. Extraction of metallic iron from ore fines is one of the challenging aspects of iron making industries as the liberation of fines blocks, the charge burden porosity and hence hinders the reduction rate. Along with size factor, mineral composition plays a vital role in the extraction process; particularly silica. As silica has the very high tendency towards iron oxide, at comparatively low temperature, the activity of silica should be suppressed to prevent silicate phases. Adjustment of such conditions is controlled by addition of lime, but sometimes excessive slag generation increases the cost of production. In the present work, carbothermic reduction of partially reduced iron bearing pellets has been melted through 20 KW DC arc plasma furnace, and a comparative study has been made for considering different slag chemistry approaches. Pellets as aforementioned are made available from Patnaik Steel and Alloys Ltd, Odisha, having high silica content ore fines (of about 8.6%) as obtained from the chemical analysis. X-Ray analysis and optical image analyzer result of sinter thus obtained reveal that fayalite phase has major fractional value. Smelting works were done for sinter with/without adjustment of slag chemistry, where argon and nitrogen were used as plasma forming gases. A range of recovery rates (between 87-94%) is achieved by charge composition, ionizing gases, and smelting duration. It is observed that use of nitrogen as plasma forming gas increases the recovery rate than that of using only argon plasma; due to high energy flux of nitrogen which increases the enthalpy due to its diatomicity. A maximum recovery rate of about 94% is achieved for process duration of 13minutes utilizing nitrogen plasma. Smelting of charge with the addition of hydrated lime targeting melilite as final slag resulted in the formation of metallic iron as confirmed from XRD and XRF analyses. In the other hand, ferrosilicon is liberated in the metallic parts where smelting of charge was done without adjustment of slag chemistry. Both metal and slag thus obtained are characterized by XRD, XRF, microhardness and wet chemical analysis suitably.

Preparation of YBa2Cu3O7 High Tc Superconducting Coatings by Plasma Spraying

NASA Astrophysics Data System (ADS)

Danroc, J.; Lacombe, J.

The following sections are included: * INTRODUCTION * THE COMPOUND YBa2Cu3O7-δ * Structure * Critical temperature * Critical current density * Phase equilibria in the YBaCuO system * PREPARATION OF YBa2Cu3O7 COATINGS * General organisation of the preparation process * The powder * Hot plasma spraying of YBa2Cu3O7 * The post-spraying thermal treatment * CHARACTERISTICS OF THE YBa2Cu3O7-δ COATINGS * Chemical composition * Crystalline structure * Morphology of the coatings * Electrical and magnetic characteristics * Conclusion * REFERENCES

Pulsed Plasma Processing of Diesel Engine Exhaust Final Report CRADA No. TC-0336-92-1-C

DOE Office of Scientific and Technical Information (OSTI.GOV)

Merritt, Bernard T.; Broering, Louis

The goal was to develop an exhaust-gas treatment process for the reduction of NO x and hydrocarbon from diesel engines. The project began believing that direct chemical reduction on NO x was possible through the use of non-thermal plasmas. The original CRADA began in 1993 and was scheduled to finish in 1996. It had as its goals three metrics: 1) remove two grams/brake-horse-power-hour of NOx, 2) have no more than five percent energy penalty, and 3) cost no more than ten percent of the engine cost. These goals were all aimed at heavy-duty diesel trucks. This CRADA had its Defensemore » Program funding eliminated by DOE prior to completion in 1995. Prior to loss of funding from DOE, LLNL discovered that due to the large oxygen content in diesel exhaust, direct chemical reduction was not possible. In understanding why, a breakthrough was achieved that combined the use of a non-thermal plasma and a catalyst. This process was named Plasma Assisted Catalytic Reduction (P ACR). Because of this breakthrough, the CRADA became a funds-in only CRADA, once DOE DP funding ended. As a result, the funding decreased from about 1M dollars per year to about $400k per year. Subsequently, progress slowed as well. The CRADA was amended several times to reflect the funds-in nature. At each amendment, the deliverables were modified; the goals remained the same but the focus changed from heavy-duty to lightduty to SUVs. The diesel-engine NO x problem is similar to the furnace and boiler NO x emission problem with the added constraint that ammonia-like additives are impractical for a mobile source. Lean-burning gasoline engines are an additional area of application because the standard three-way catalyst is rendered ineffective by the presence of oxygen. In the P ACR process an electrical discharge is used to create a non-thermal plasma that contains oxidative radicals O and OH. These oxidative radicals convert NO to NO 2. Selective catalytic reduction using a readily available catalyst then converts the NO 2 to harmless gases, N 2 and 0 2.« less

Fluorine and oxygen plasma influence on nanoparticle formation and aggregation in metal oxide thin film transistors

NASA Astrophysics Data System (ADS)

MÄ dzik, Mateusz; Elamurugu, Elangovan; Viegas, Jaime

2017-03-01

Despite recent advances in metal oxide thin-film transistor technology, there are no foundry processes available yet for large-scale deployment of metal oxide electronics and photonics, in a similar way as found for silicon based electronics and photonics. One of the biggest challenges of the metal oxide platform is the stability of the fabricated devices. Also, there is wide dispersion on the measured specifications of fabricated TFT, from lot-to-lot and from different research groups. This can be partially explained by the importance of the deposition method and its parameters, which determine thin film microstructure and thus its electrical properties. Furthermore, substrate pretreatment is an important factor, as it may act as a template for material growth. Not so often mentioned, plasma processes can also affect the morphology of deposited films on further deposition steps, such as inducing nanoparticle formation, which strongly impact the conduction mechanism in the channel layer of the TFT. In this study, molybdenum doped indium oxide is sputtered onto ALD deposited HfO2 with or without pattering, and etched by RIE chlorine based processing. Nanoparticle formation is observed when photoresist is removed by oxygen plasma ashing. HfO2 etching in CF4/Ar plasma prior to resist stripping in oxygen plasma promotes the aggregation of nanoparticles into nanosized branched structures. Such nanostructuring is absent when oxygen plasma steps are replaced by chemical wet processing with acetone. Finally, in order to understand the electronic transport effect of the nanoparticles on metal oxide thin film transistors, TFT have been fabricated and electrically characterized.

Morphologies of Solid Surfaces Produced Far from Equilibrium

DTIC Science & Technology

1991-03-10

common to all these applications is that thc surface preparation processes used are far from chemical equilibrium. Many of the processes involve an...energetic ion beam, plasma or gas that is used to modify a surface, either by etching or depositing material. The electrical, optical and mechanical...growth, a number of continuum models have been used in the materials science literature, in particular in the context of electron-beam etching of

Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge

DOEpatents

Selwyn, Gary S.; Henins, Ivars; Park, Jaeyoung; Herrmann, Hans W.

2006-04-11

Apparatus for the processing of materials involving placing a material either placed between an radio-frequency electrode and a ground electrode, or which is itself one of the electrodes. This is done in atmospheric pressure conditions. The apparatus effectively etches or cleans substrates, such as silicon wafers, or provides cleaning of spools and drums, and uses a gas containing an inert gas and a chemically reactive gas.

Modelling of low-temperature/large-area distributed antenna array microwave-plasma reactor used for nanocrystalline diamond deposition

NASA Astrophysics Data System (ADS)

Bénédic, Fabien; Baudrillart, Benoit; Achard, Jocelyn

2018-02-01

In this paper we investigate a distributed antenna array Plasma Enhanced Chemical Vapor Deposition system, composed of 16 microwave plasma sources arranged in a 2D matrix, which enables the growth of 4-in. diamond films at low pressure and low substrate temperature by using H2/CH4/CO2 gas chemistry. A self-consistent two-dimensional plasma model developed for hydrogen discharges is used to study the discharge behavior. Especially, the gas temperature is estimated close to 350 K at a position corresponding to the substrate location during the growth, which is suitable for low temperature deposition. Multi-source discharge modeling evidences that the uniformity of the plasma sheet formed by the individual plasmas ignited around each elementary microwave source strongly depends on the distance to the antennas. The radial profile of the film thickness homogeneity may be thus linked to the local variations of species density. Contribution to the topical issue "Plasma Sources and Plasma Processes (PSPP)", edited by Luis Lemos Alves, Thierry Belmonte and Tibeinea Minea.

[Fundamentals of plasma chemistry and its application to drug engineering].

PubMed

Kuzuya, M

1996-04-01

In this review, our novel research works in both low temperature plasma chemistry and solid state plasma chemistry were described. As for low temperature plasma, the ESR study on plasma-induced radicals of several selected conventional polymers was shown including the detailed analyses of the radical structure and the mechanism by which the radicals were formed on typical degradable methacrylic polymers and cross-linkable polystyrene. One of the pharmaceutical applications of the plasma processing for drug delivery system (DDS) was also described, which includes the preparations of double-compressed tablet consisting of drugs as a core material and various types of polymers as a wall material followed by plasma-irradiation on such a tablet. As for solid state plasma, the detailed reaction mechanism of solid state mechanochemical polymerization was shown including the solid state single electron transfer and the special feature of the resulting polymers. The structural criteria for polymerizable monomer derived from the quantum chemical considerations were also established. Based on the above findings, we synthesized various polymeric prodrugs by mechanochemical polymerization and studied the nature of hydrolyses (drug release).

Shaping thin film growth and microstructure pathways via plasma and deposition energy: a detailed theoretical, computational and experimental analysis.

PubMed

Sahu, Bibhuti Bhusan; Han, Jeon Geon; Kersten, Holger

2017-02-15

Understanding the science and engineering of thin films using plasma assisted deposition methods with controlled growth and microstructure is a key issue in modern nanotechnology, impacting both fundamental research and technological applications. Different plasma parameters like electrons, ions, radical species and neutrals play a critical role in nucleation and growth and the corresponding film microstructure as well as plasma-induced surface chemistry. The film microstructure is also closely associated with deposition energy which is controlled by electrons, ions, radical species and activated neutrals. The integrated studies on the fundamental physical properties that govern the plasmas seek to determine their structure and modification capabilities under specific experimental conditions. There is a requirement for identification, determination, and quantification of the surface activity of the species in the plasma. Here, we report a detailed study of hydrogenated amorphous and crystalline silicon (c-Si:H) processes to investigate the evolution of plasma parameters using a theoretical model. The deposition processes undertaken using a plasma enhanced chemical vapor deposition method are characterized by a reactive mixture of hydrogen and silane. Later, various contributions of energy fluxes on the substrate are considered and modeled to investigate their role in the growth of the microstructure of the deposited film. Numerous plasma diagnostic tools are used to compare the experimental data with the theoretical results. The film growth and microstructure are evaluated in light of deposition energy flux under different operating conditions.

Investigation of Sterilization Mechanism for Geobacillus stearothermophilus Spores with Plasma-Excited Neutral Gas

NASA Astrophysics Data System (ADS)

Matsui, Kei; Ikenaga, Noriaki; Sakudo, Noriyuki

2015-09-01

We investigate the mechanism of the sterilization with plasma-excited neutral gas that uniformly sterilizes both the space and inner wall of the reactor chamber at atmospheric pressure. Only reactive neutral species such as plasma-excited gas molecules and radicals are separated from the plasma and sent to the reactor chamber for chemical sterilization. The plasma source gas uses humidified mixture of nitrogen and oxygen. Geobacillus stearothermophilus spores and tyrosine which is amino acid are treated by the plasma-excited neutral gas. Shape change of the treated spore is observed by SEM, and chemical modification of the treated tyrosine is analyzed by HPLC. As a result, the surface of the treated spore shows depression. Hydroxylation and nitration of tyrosine are shown after the treatment. For these reasons, we believe that the sterilization with plasma-excited neutral gas results from the deformation of spore structure due to the chemical modification of amino acid.

Method development for the determination of 24S-hydroxycholesterol in human plasma without derivatization by high-performance liquid chromatography with tandem mass spectrometry in atmospheric pressure chemical ionization mode.

PubMed

Sugimoto, Hiroshi; Kakehi, Masaaki; Satomi, Yoshinori; Kamiguchi, Hidenori; Jinno, Fumihiro

2015-10-01

We developed a highly sensitive and specific high-performance liquid chromatography with tandem mass spectrometry method with an atmospheric pressure chemical ionization interface to determine 24S-hydroxycholesterol, a major metabolite of cholesterol formed by cytochrome P450 family 46A1, in human plasma without any derivatization step. Phosphate buffered saline including 1% Tween 80 was used as the surrogate matrix for preparation of calibration curves and quality control samples. The saponification process to convert esterified 24S-hydroxycholesterol to free sterols was optimized, followed by liquid-liquid extraction using hexane. Chromatographic separation of 24S-hydroxycholesterol from other isobaric endogenous oxysterols was successfully achieved with gradient mobile phase comprised of 0.1% propionic acid and acetonitrile using L-column2 ODS (2 μm, 2.1 mm id × 150 mm). This assay was capable of determining 24S-hydroxycholesterol in human plasma (200 μL) ranging from 1 to 100 ng/mL with acceptable intra- and inter-day precision and accuracy. The potential risk of in vitro formation of 24S-hydroxycholesterol by oxidation from endogenous cholesterol in human plasma was found to be negligible. The stability of 24S-hydroxycholesterol in relevant solvents and human plasma was confirmed. This method was successfully applied to quantify the plasma concentrations of 24S-hydroxycholesterol in male and female volunteers. © 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Disposal of olive mill wastewater with DC arc plasma method.

PubMed

Ibrahimoglu, Beycan; Yilmazoglu, M Zeki

2018-07-01

Olive mill wastewater is an industrial waste, generated as a byproduct of olive oil production process and generally contains components such as organic matter, suspended solids, oil, and grease. Although various methods have been developed to achieve the disposal of this industrial wastewater, due to the low cost, the most common disposal application is the passive storage in the lagoons. The main objective of this study is to reduce pollution parameters in olive mill wastewater and draw water to discharge limits by using plasma technology. Plasma-assisted disposal of olive mill wastewater method could be an alternative disposal technique when considering potential utilization of treated water in agricultural areas and economic value of flammable plasma gas which is the byproduct of disposal process. According to the experimental results, the rates of COD (chemical oxygen demand) and BOD (biological oxygen demand) of olive mill wastewater are decreased by 94.42% and 95.37%, respectively. The dissolved oxygen amount is increased from 0.36 to 6.97 mg/l. In addition, plasma gas with high H 2 content and treated water that can be used in agricultural areas for irrigation are obtained from non-dischargeable wastewater. Copyright © 2018 Elsevier Ltd. All rights reserved.

Durable anti-fogging effect and adhesion improvement on polymer surfaces

NASA Astrophysics Data System (ADS)

Moser, E. M.; Gilliéron, D.; Henrion, G.

2010-01-01

The hydrophobic properties of polymeric surfaces may cause fogging in transparent packaging and poor adhesion to printing colours and coatings. Novel plasma processes for durable functionalization of polypropylene and polyethylene terephthalate substrates were developed and analysed using optical emission spectroscopy. A worm-like nano pattern was created on the polypropylene surface prior to the deposition of thin polar plasma polymerised layers. For both substrates, highly polar surfaces exhibiting a surface tension of up to 69 mN/m and a water contact angle of about 10° were produced - providing the anti-fogging effect. The deposition of thin plasma polymerised layers protects the increased surface areas and enables to tailoring the surface energy of the substrate in a wide range. Wetting characteristics were determined by dynamic contact angle measurements. Investigations of the chemical composition of several layers using X-ray photoelectron spectroscopy and FT-infrared spectroscopy were correlated with functional testing. The surface topography was investigated using atomic force microscopy. The weldability and peeling-off characteristics of the plasma treated polymer films could be adjusted by varying the process parameters. Global and specific migration analyses were undertaken in order to ensure the manufacturing of plasma treated polymer surfaces for direct food contact purposes.

Time-dependent areal mass density for disc-shaped substrates in a corona-activated flow stream at atmospheric pressure for argon/acetylene admixture

NASA Astrophysics Data System (ADS)

Xie, Shuzheng; Islam, Rokibul; Hussein, Bashir; Englund, Karl; Pedrow, Patrick

2015-09-01

In this research we use a 40-needle array energized with 60 Hz AC voltage in the range 5 to 15 kV RMS. Plasma processing takes place downstream from a grounded planar screen (the opposing electrode). The needle-to-screen gap is in the range 4 to 10 cm and its E-field generates weakly ionized plasma via streamers and back corona. Deposited material is plasma-polymerized acetylene. Substrates are potassium bromide, mica, wood, paper, and gold-covered solids. Substrate chemical species influence the efficiency with which the disc amasses plasma-polymerized material, at least until the substrate is fully covered with film. Early plasma-polymerization is accompanied by nucleation-site-dominated nodules but longer term deposition results in a film that fully covers the substrate. We will report on time-dependent areal mass density associated with run times in the range 5-60 minutes. Film thickness will be measured using instruments that include visible light microscopy, TEM, and SEM. Others in our research group are studying areal mass density for early times (1-5 minutes) when nodule growth (at nucleation sites) dominates the deposition process.

Determining the microwave coupling and operational efficiencies of a microwave plasma assisted chemical vapor deposition reactor under high pressure diamond synthesis operating conditions

DOE Office of Scientific and Technical Information (OSTI.GOV)

Nad, Shreya; Department of Physics and Astronomy, Michigan State University, East Lansing, Michigan 48824; Gu, Yajun

2015-07-15

The microwave coupling efficiency of the 2.45 GHz, microwave plasma assisted diamond synthesis process is investigated by experimentally measuring the performance of a specific single mode excited, internally tuned microwave plasma reactor. Plasma reactor coupling efficiencies (η) > 90% are achieved over the entire 100–260 Torr pressure range and 1.5–2.4 kW input power diamond synthesis regime. When operating at a specific experimental operating condition, small additional internal tuning adjustments can be made to achieve η > 98%. When the plasma reactor has low empty cavity losses, i.e., the empty cavity quality factor is >1500, then overall microwave discharge coupling efficienciesmore » (η{sub coup}) of >94% can be achieved. A large, safe, and efficient experimental operating regime is identified. Both substrate hot spots and the formation of microwave plasmoids are eliminated when operating within this regime. This investigation suggests that both the reactor design and the reactor process operation must be considered when attempting to lower diamond synthesis electrical energy costs while still enabling a very versatile and flexible operation performance.« less

Chemical compatibility and properties of suspension plasma-sprayed SrTiO3-based anodes for intermediate-temperature solid oxide fuel cells

NASA Astrophysics Data System (ADS)

Zhang, Shan-Lin; Li, Cheng-Xin; Li, Chang-Jiu

2014-10-01

La-doped strontium titanate (LST) is a promising, redox-stable perovskite material for direct hydrocarbon oxidation anodes in intermediate-temperature solid oxide fuel cells (IT-SOFCs). In this study, nano-sized LST and Sm-doped ceria (SDC) powders are produced by the sol-gel and glycine-nitrate processes, respectively. The chemical compatibility between LST and electrolyte materials is studied. A LST-SDC composite anode is prepared by suspension plasma spraying (SPS). The effects of annealing conditions on the phase structure, microstructure, and chemical stability of the LST-SDC composite anode are investigated. The results indicate that the suspension plasma-sprayed LST-SDC anode has the same phase structure as the original powders. LST exhibits a good chemical compatibility with SDC and Mg/Sr-doped lanthanum gallate (LSGM). The anode has a porosity of ∼40% with a finely porous structure that provides high gas permeability and a long three-phase boundary for the anode reaction. Single cells assembled with the LST-SDC anode, La0.8Sr0.2Ga0.8Mg0.2O3 electrolyte, and La0.8Sr0.2CoO3-SDC cathode show a good performance at 650-800 °C. The annealing reduces the impedances due to the enhancement in the bonding between the particles in the anode and interface of anode and LSGM electrolyte, thus improving the output performance of the cell.

Controlled gas-liquid interfacial plasmas for synthesis of nano-bio-carbon conjugate materials

NASA Astrophysics Data System (ADS)

Kaneko, Toshiro; Hatakeyama, Rikizo

2018-01-01

Plasmas generated in contact with a liquid have been recognized to be a novel reactive field in nano-bio-carbon conjugate creation because several new chemical reactions have been yielded at the gas-liquid interface, which were induced by the physical dynamics of non-equilibrium plasmas. One is the ion irradiation to a liquid, which caused the spatially selective dissociation of the liquid and the generation of additive reducing and oxidizing agents, resulting in the spatially controlled synthesis of nanostructures. The other is the electron irradiation to a liquid, which directly enhanced the reduction action at the plasma-liquid interface, resulting in temporally controlled nanomaterial synthesis. Using this novel reaction field, gold nanoparticles with controlled interparticle distance were synthesized using carbon nanotubes as a template. Furthermore, nanoparticle-biomolecule conjugates and nanocarbon-biomolecule conjugates were successfully synthesized by an aqueous-solution contact plasma and an electrolyte plasma, respectively, which were rapid and low-damage processes suitable for nano-bio-carbon conjugate materials.

Kinetic modeling of streamer penetration into de-ionized water

NASA Astrophysics Data System (ADS)

Levko, Dmitry; Sharma, Ashish; Raja, Laxminarayan L.

2018-03-01

Interest in plasma-liquid interaction phenomena has grown in recent years due to applications in plasma medicine, water purification, and plasma-hydrocarbon reforming. The plasma in contact with liquid is generated, for example, using the plasma jets or streamer discharges. The interaction between the streamer and water can cause both physical and chemical modifications of the liquid. In this paper, the interaction between an anode-directed streamer and the de-ionized water is studied using one-dimensional particle-in-cell Monte Carlo collisions model. In this model, plasma species in both gas and liquid phase are considered as the macro-particles. We find that the penetration of the streamer head into the liquid causes ionization of water molecules by electron impact, a process which is usually ignored in the fluid models. The main charge carriers in the liquid phase are negative water ions which agree with earlier experimental and computational modeling studies. Additionally, we observe an ion-rich sheath in the vicinity of the water surface on the gas side.

Duty cycle dependent chemical structure and wettability of RF pulsed plasma copolymers of acrylic acid and octafluorocyclobutane

NASA Astrophysics Data System (ADS)

Muzammil, I.; Li, Y. P.; Li, X. Y.; Lei, M. K.

2018-04-01

Octafluorocyclobutane and acrylic acid (C4F8-co-AA) plasma copolymer coatings are deposited using a pulsed wave (PW) radio frequency (RF) plasma on low density polyethylene (LDPE). The influence of duty cycle in pulsed process with the monomer feed rate on the surface chemistry and wettability of C4F8-co-AA plasma polymer coatings is studied. The concentration of the carboxylic acid (hydrophilic) groups increase, and that of fluorocarbon (hydrophobic) groups decrease by lowering the duty cycle. The combined effect of surface chemistry and surface morphology of the RF pulsed plasma copolymer coatings causes tunable surface wettability and surface adhesion. The gradual emergence of hydrophilic contents leads to surface heterogeneity by lowering duty cycle causing an increased surface adhesion in hydrophobic coatings. The C4F8-co-AA plasma polymer coatings on the nanotextured surfaces are tuned from repulsive superhydrophobicity to adhesive superhydrophobicity, and further to superhydrophilicity by adjusting the duty cycles with the monomer feed rates.

Microwave plasma induced surface modification of diamond-like carbon films

NASA Astrophysics Data System (ADS)

Rao Polaki, Shyamala; Kumar, Niranjan; Gopala Krishna, Nanda; Madapu, Kishore; Kamruddin, Mohamed; Dash, Sitaram; Tyagi, Ashok Kumar

2017-12-01

Tailoring the surface of diamond-like carbon (DLC) film is technically relevant for altering the physical and chemical properties, desirable for useful applications. A physically smooth and sp3 dominated DLC film with tetrahedral coordination was prepared by plasma-enhanced chemical vapor deposition technique. The surface of the DLC film was exposed to hydrogen, oxygen and nitrogen plasma for physical and chemical modifications. The surface modification was based on the concept of adsorption-desorption of plasma species and surface entities of films. Energetic chemical species of microwave plasma are adsorbed, leading to desorbtion of the surface carbon atoms due to energy and momentum exchange. The interaction of such reactive species with DLC films enhanced the roughness, surface defects and dangling bonds of carbon atoms. Adsorbed hydrogen, oxygen and nitrogen formed a covalent network while saturating the dangling carbon bonds around the tetrahedral sp3 valency. The modified surface chemical affinity depends upon the charge carriers and electron covalency of the adsorbed atoms. The contact angle of chemically reconstructed surface increases when a water droplet interacts either through hydrogen or van dear Waals bonding. These weak interactions influenced the wetting property of the DLC surface to a great extent.

Alternating SiCl4/O2 passivation steps with SF6 etch steps for silicon deep etching

NASA Astrophysics Data System (ADS)

Duluard, C. Y.; Ranson, P.; Pichon, L. E.; Pereira, J.; Oubensaid, E. H.; Lefaucheux, P.; Puech, M.; Dussart, R.

2011-06-01

Deep etching of silicon has been investigated in an inductively coupled plasma etch reactor using short SiCl4/O2 plasma steps to passivate the sidewalls of the etched structures. A study was first carried out to define the appropriate parameters to create, at a substrate temperature of -20 °C, a passivation layer by SiCl4/O2 plasma that resists lateral chemical etching in SF6 plasma. The most efficient passivation layer was obtained for a SiCl4/O2 gas flow ratio of 2:1, a pressure of 1 Pa and a source power of 1000 W. Ex situ analyses on a film deposited with these parameters show that it is very rich in oxygen. Silicon etching processes that alternate SF6 plasma etch steps with SiCl4/O2 plasma passivation steps were then developed. Preliminary tests in pulsed-mode conditions have enabled etch rates greater than 2 µm min-1 with selectivities higher than 220. These results show that it is possible to develop a silicon deep etching process at substrate temperatures around -20 °C that uses low SiCl4 and O2 gas flows instead of conventional fluorocarbon gases for sidewall protection.

Effect of the chamber wall on fluorocarbon-assisted atomic layer etching of SiO{sub 2} using cyclic Ar/C{sub 4}F{sub 8} plasma

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kawakami, Masatoshi; Metzler, Dominik; Oehrlein, Gottlieb S., E-mail: oehrlein@umd.edu

2016-07-15

The authors studied the effect of the temperature and chemical state of the chamber wall on process performance for atomic layer etching of SiO{sub 2} using a steady-state Ar plasma, periodic injection of a defined number of C{sub 4}F{sub 8} molecules, and synchronized plasma-based Ar{sup +} ion bombardment. To evaluate these effects, the authors measured the quartz coupling window temperature. The plasma gas phase chemistry was characterized using optical emission spectroscopy. It was found that although the thickness of the polymer film deposited in each cycle is constant, the etching behavior changed, which is likely related to a change inmore » the plasma gas phase chemistry. The authors found that the main gas phase changes occur after C{sub 4}F{sub 8} injection. The C{sub 4}F{sub 8} and the quartz window react and generate SiF and CO. The emission intensity changes with wall surface state and temperature. Therefore, changes in the plasma gas species generation can lead to a shift in etching performance during processing. During initial cycles, minimal etching is observed, while etching gradually increases with cycle number.« less

CO2 Dissociation using the Versatile Atmospheric Dielectric Barrier Discharge Experiment (VADER)

NASA Astrophysics Data System (ADS)

Lindon, Michael Allen

As of 2013, the Carbon Dioxide Information Analysis Center (CDIAC) estimates that the world emits approximately 36 trillion metric tons of Carbon Dioxide (CO2) into the atmosphere every year. These large emissions have been correlated to global warming trends that have many consequences across the globe, including glacial retraction, ocean acidification and increased severity of weather events. With green technologies still in the infancy stage, it can be expected that CO2 emissions will stay this way for along time to come. Approximately 41% of the emissions are due to electricity production, which pump out condensed forms of CO2. This danger to our world is why research towards new and innovative ways of controlling CO2 emissions from these large sources is necessary. As of now, research is focused on two primary methods of CO2 reduction from condensed CO2 emission sources (like fossil fuel power plants): Carbon Capture and Sequestration (CCS) and Carbon Capture and Utilization (CCU). CCS is the process of collecting CO2 using absorbers or chemicals, extracting the gas from those absorbers and finally pumping the gas into reservoirs. CCU on the other hand, is the process of reacting CO2 to form value added chemicals, which can then be recycled or stored chemically. A Dielectric Barrier discharge (DBD) is a pulsed, low temperature, non-thermal, atmospheric pressure plasma which creates high energy electrons suitable for dissociating CO2 into its components (CO and O) as one step in the CCU process. Here I discuss the viability of using a DBD for CO2 dissociation on an industrial scale as well as the fundamental physics and chemistry of a DBD for CO2 dissociation. This work involved modeling the DBD discharge and chemistry, which showed that there are specific chemical pathways and plasma parameters that can be adjusted to improve the CO2 reaction efficiencies and rates. Experimental studies using the Versatile Atmospheric dielectric barrier Discharge ExpeRiment (VADER) demonstrated how different factors, like voltage, frequency and the addition of a photocatalyst, change the efficiency of CO2 dissociation in VADER and the plasma chemistry involved.

A comparative study of capacitively coupled HBr/He, HBr/Ar plasmas for etching applications: Numerical investigation by fluid model

DOE Office of Scientific and Technical Information (OSTI.GOV)

Gul, Banat, E-mail: banatgul@gmail.com; Research Group PLASMANT, Department of Chemistry, University of Antwerp, Universiteitsplein 1, B-2610 Antwerp; Aman-ur-Rehman, E-mail: amansadiq@gmail.com

Fluid model has been applied to perform a comparative study of hydrogen bromide (HBr)/He and HBr/Ar capacitively coupled plasma discharges that are being used for anisotropic etching process. This model has been used to identify the most dominant species in HBr based plasmas. Our simulation results show that the neutral species like H and Br, which are the key player in chemical etching, have bell shape distribution, while ions like HBr{sup +}, Br{sup +}, which play a dominant rule in the physical etching, have double humped distribution and show peaks near electrodes. It was found that the dilution of HBrmore » by Ar and/or He results in an increase in electron density and electron temperature, which results in more ionization and dissociation and hence higher densities of neutral and charged species can be achieved. The ratio of positive ion flux to the neutral flux increases with an increase in additive gas fraction. Compare to HBr/He plasma, the HBr/Ar plasma shows a maximum change in the ion density and flux and hence the etching rate can be considered in the ion-assisted and in the ion-flux etch regime in HBr/Ar discharge. The densities of electron and other dominant species in HBr/Ar plasma are higher than those of HBr/He plasma. The densities and fluxes of the active neutrals and positive ions for etching and subsequently chemical etching versus physical sputtering in HBr/Ar and HBr/He plasmas discharge can be controlled by tuning gas mixture ratio and the desire etching can be achieved.« less

A comparative study on the activity of TiO2 in pulsed plasma under different discharge conditions

NASA Astrophysics Data System (ADS)

Lijuan, DUAN; Nan, JIANG; Na, LU; Kefeng, SHANG; Jie, LI; Yan, WU

2018-05-01

In the present study, a combination of pulsed discharge plasma and TiO2 (plasma/TiO2) has been developed in order to study the activity of TiO2 by varying the discharge conditions of pulsed voltage, discharge mode, air flow rate and solution conductivity. Phenol was used as the chemical probe to characterize the activity of TiO2 in a pulsed discharge system. The experimental results showed that the phenol removal efficiency could be improved by about 10% by increasing the applied voltage. The phenol removal efficiency for three discharge modes in the plasma-discharge-alone system was found to be highest in the spark mode, followed by the spark–streamer mode and finally the streamer mode. In the plasma/TiO2 system, the highest catalytic effect of TiO2 was observed in the spark–streamer discharge mode, which may be attributed to the favorable chemical and physical effects from the spark–streamer discharge mode, such as ultraviolet light, O3, H2O2, pyrolysis, shockwaves and high-energy electrons. Meanwhile, the optimal flow rate and conductivity were 0.05 m3 l‑1 and 10 μS cm‑1, respectively. The main phenolic intermediates were hydroquinone, catechol, and p-benzoquinone during the discharge treatment process. A different phenol degradation pathway was observed in the plasma/TiO2 system as compared to plasma alone. Analysis of the reaction intermediates demonstrated that p-benzoquinone reduction was selectively catalyzed on the TiO2 surface. The effective decomposition of phenol constant (D e) increased from 74.11% to 79.16% when TiO2 was added, indicating that higher phenol mineralization was achieved in the plasma/TiO2 system.

The effect of VUV radiation from Ar/O2 plasmas on low-k SiOCH films

NASA Astrophysics Data System (ADS)

Lee, J.; Graves, D. B.

2011-08-01

The degradation of porous low-k materials, like SiOCH, under plasma processing continues to be a problem in the next generation of integrated-circuit fabrication. Due to the exposure of the film to many species during plasma treatment, such as photons, ions, radicals, etc, it is difficult to identify the mechanisms responsible for plasma-induced damage. Using a vacuum beam apparatus with a calibrated Xe vacuum ultraviolet (VUV) lamp, we show that 147 nm VUV photons and molecular O2 alone can damage these low-k materials. Using Fourier-transform infrared (FTIR) spectroscopy, we show that VUV/O2 exposure causes a loss of methylated species, resulting in a hydrophilic, SiOx-like layer that is susceptible to H2O absorption, leading to an increased dielectric constant. The effect of VUV radiation on chemical modification of porous SiOCH films in the vacuum beam apparatus and in Ar and O2 plasma exposure was found to be a significant contributor to dielectric damage. Measurements of dielectric constant change using a mercury probe are consistent with chemical modification inferred from FTIR analysis. Furthermore, the extent of chemical modification appears to be limited by the penetration depth of the VUV photons, which is dependent on wavelength of radiation. The creation of a SiOx-like layer near the surface of the material, which grows deeper as more methyl is extracted, introduces a dynamic change of VUV absorption throughout the material over time. As a result, the rate of methyl loss is continuously changing during the exposure. We present a model that attempts to capture this dynamic behaviour and compare the model predictions to experimental data through a fitting parameter that represents the effective photo-induced methyl removal. While this model accurately simulates the methyl loss through VUV exposure by the Xe lamp and Ar plasma, the methyl loss from VUV photons in O2 plasma are only accurately depicted at longer exposure times. We conclude that other species, such as oxygen radicals or ions, may play a major role in chemical modification at short times near the surface of the material, while VUV photons contribute to the majority of the damage in the bulk.

Selective deposition of a crystalline Si film by a chemical sputtering process in a high pressure hydrogen plasma

DOE Office of Scientific and Technical Information (OSTI.GOV)

Ohmi, Hiromasa, E-mail: ohmi@prec.eng.osaka-u.ac.jp; Yasutake, Kiyoshi; Research Center for Ultra-Precision Science and Technology, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871

2015-07-28

The selective deposition of Si films was demonstrated using a chemical sputtering process induced by a high pressure hydrogen plasma at 52.6 kPa (400 Torr). In this chemical sputtering process, the initial deposition rate (R{sub d}) is dependent upon the substrate type. At the initial stage of Si film formation, R{sub d} on glass substrates increased with elapsed time and reached to a constant value. In contrast, R{sub d} on Si substrates remained constant during the deposition. The selective deposition of Si films can be achieved by adjusting the substrate temperature (T{sub sub}) and hydrogen concentration (C{sub H2}) in the process atmosphere.more » For any given deposition time, it was found that an optimum C{sub H2} exists for a given T{sub sub} to realize the selective deposition of a Si film, and the optimum T{sub sub} value tends to increase with decreasing C{sub H2}. According to electron diffraction patterns obtained from the samples, the selectively prepared Si films showed epitaxial-like growth, although the Si films contained many defects. It was revealed by Raman scattering spectroscopy that some of the defects in the Si films were platelet defects induced by excess hydrogen incorporated during Si film formation. Raman spectrum also suggested that Si related radicals (SiH{sub 2}, SiH, Si) with high reactivity contribute to the Si film formation. Simple model was derived as the guideline for achieving the selective growth.« less

A process to fabricate fused silica nanofluidic devices with embedded electrodes using an optimized room temperature bonding technique

NASA Astrophysics Data System (ADS)

Boden, Seth; Karam, P.; Schmidt, A.; Pennathur, S.

2017-05-01

Fused silica is an ideal material for nanofluidic systems due to its extreme purity, chemical inertness, optical transparency, and native hydrophilicity. However, devices requiring embedded electrodes (e.g., for bioanalytical applications) are difficult to realize given the typical high temperature fusion bonding requirements (˜1000 °C). In this work, we optimize a two-step plasma activation process which involves an oxygen plasma treatment followed by a nitrogen plasma treatment to increase the fusion bonding strength of fused silica at room temperature. We conduct a parametric study of this treatment to investigate its effect on bonding strength, surface roughness, and microstructure morphology. We find that by including a nitrogen plasma treatment to the standard oxygen plasma activation process, the room temperature bonding strength increases by 70% (0.342 J/m2 to 0.578 J/m2). Employing this optimized process, we fabricate and characterize a nanofluidic device with an integrated and dielectrically separated electrode. Our results prove that the channels do not leak with over 1 MPa of applied pressure after a 24 h storage time, and the electrode exhibits capacitive behavior with a finite parallel resistance in the upper MΩ range for up to a 6.3Vdc bias. These data thus allow us to overcome the barrier that has barred nanofluidic progress for the last decade, namely, the development of nanometer scale well-defined channels with embedded metallic materials for far-reaching applications such as the exquisite manipulation of biomolecules.

Quality control of the tribological coating PS212

NASA Technical Reports Server (NTRS)

Sliney, Harold E.; Dellacorte, Christopher; Deadmore, Daniel L.

1989-01-01

PS212 is a self-lubricating, composite coating that is applied by the plasma spray process. It is a functional lubricating coating from 25 C (or lower) to 900 C. The coating is prepared from a blend of three different powders with very dissimilar properties. Therefore, the final chemical composition and lubricating effectiveness of the coatings are very sensitive to the process variables used in their preparation. Defined here are the relevant variables. The process and analytical procedures that will result in satisfactory tribological coatings are discussed.

Kinetics and Chemistry of Ionization Wave Discharges Propagating Over Dielectric Surfaces

NASA Astrophysics Data System (ADS)

Petrishchev, Vitaly

Experimental studies of near-surface ionization wave electric discharges generated by high peak voltage (20-30 kV), nanosecond duration pulses (full width at half-maximum 50-100 ns) of positive and negative polarity and propagating over dielectric surfaces have been performed. A novel way to sustain diffuse, reproducible, ns pulse surface plasmas at a liquid-vapor interface is demonstrated at buffer gas pressures ranging from 10 to 200 Torr. Generation of surface ionization waves well reproduced shot-to-shot and sustaining diffuse near-surface plasmas is one of the principal advantages of the use of ns pulse discharge waveforms. This makes possible characterization of these plasmas in repetitively pulsed experiments. Numerous applications of these plasmas include low-temperature plasma assisted combustion, plasma fuel reforming, plasma flow control, plasma materials processing, agriculture, biology, and medicine. The objectives of the present work are (i) to demonstrate that surface ionization wave discharge plasmas sustained at a liquid-vapor interface can be used as an experimental platform for studies of near-surface plasma chemical reaction kinetics, at the conditions when the interface acts as a high-yield source of radical species, and (ii) to obtain quantitative insight into dynamics, kinetics and chemistry of surface ionization wave discharges and provide experimental data for validation of kinetic models, to assess their predictive capability. Generation of the initial radical pool may trigger a number of plasma chemical processes leading to formation of a variety of stable product species, depending on the initial composition of the liquid and the buffer gas flow. One of the products formed and detected during surface plasma / liquid water interaction is hydroxyl radical, which is closely relevant to applications of plasmas for biology and medicine. The present work includes detailed studies of surface ionization wave discharges sustained in different buffer gases over solid and liquid dielectric surfaces, such as quartz, distilled water, saline solution, and alcohols, over a wide range of pressures. Specific experiments include: measurements of ionization wave speed; plasma emission imaging using a ns gate camera; detection of surface discharge plasma chemistry products using Fourier transform infrared absorption spectroscopy; surface charge dynamics on short (ns) and long (hundreds of mus) time scales; time-resolved electron density and electron temperature measurements in a ns pulse surface discharge in helium by Thomson scattering; spatially-resolved absolute OH and H atom concentration measurements in ns pulse discharges over distilled water by single-photon and two-photon Laser Induced Fluorescence; and schlieren imaging of perturbations generated by a ns pulse dielectric barrier discharge in a surface plasma actuator in quiescent atmospheric pressure air.

Effects of oxygen plasma treatment power on Aramid fiber III/BMI composite humidity resistance properties

NASA Astrophysics Data System (ADS)

Wang, Jing; Shi, Chen; Feng, Jiayue; Long, Xi; Meng, Lingzhi; Ren, Hang

2018-01-01

The effects of oxygen plasma treatment power on Aramid Fiber III chemical structure and its reinforced bismaleimides (BMI) composite humidity resistance properties were investigated in this work. The aramid fiber III chemical structure under different plasma treatment power were measured by FTIR. The composite bending strength and interlinear shear strength with different plasma treatment power before and after absorption water were tested respectively. The composite rupture morphology was observed by SEM. The FTIR results showed that oxygen plasma treatment do not change the fiber bulk chemical structure. The composite humidity resistance of bending strength and interlinear shear strength are similar for untreated and plasma treated samples. The retention rate of composite bending strength and interlinear shear strength are about 75% and 94%, respectively. The composite rupture mode turns to be the fiber failure after water absorption.

Preliminary Experimental Results using a Steady State ICP Flow Reactor to Investigate Condensation Chemistry for Nuclear Forensics

NASA Astrophysics Data System (ADS)

Koroglu, Batikan; Armstrong, Mike; Cappelli, Mark; Chernov, Alex; Crowhurst, Jonathan; Mehl, Marco; Radousky, Harry; Rose, Timothy; Zaug, Joe

2016-10-01

The high temperature chemistry of rapidly condensing matter is under investigation using a steady state inductively coupled plasma (ICP) flow reactor. The objective is to study chemical processes on cooling time scales similar to that of a low yield nuclear fireball. The reactor has a nested set of gas flow rings that provide flexibility in the control of hydrodynamic conditions and mixing of chemical components. Initial tests were run using two different aqueous solutions (ferric nitrate and uranyl nitrate). Chemical reactants passing through the plasma torch undergo non-linear cooling from 10,000K to 1,000K on time scales of <0.1 to 0.5s depending on flow conditions. Optical spectroscopy measurements were taken at different positions along the flow axis to observe the in situ spatial and temporal evolution of chemical species at different temperatures. The current data offer insights into the changes in oxide chemistry as a function of oxygen fugacity. The time resolved measurements will also serve as a validation target for the development of kinetic models that will be used to describe chemical fractionation during nuclear fireball condensation. This work was performed under the auspices of the U.S. Department of Energy by Lawrence Livermore National Laboratory under Contract DE-AC52-07NA27344.

A decontamination study of simulated chemical and biological agents

NASA Astrophysics Data System (ADS)

Uhm, Han S.; Lee, Han Y.; Hong, Yong C.; Shin, Dong H.; Park, Yun H.; Hong, Yi F.; Lee, Chong K.

2007-07-01

A comprehensive decontamination scheme of the chemical and biological agents, including airborne agents and surface contaminating agents, is presented. When a chemical and biological attack occurs, it is critical to decontaminate facilities or equipments to an acceptable level in a very short time. The plasma flame presented here may provide a rapid and effective elimination of toxic substances in the interior air in isolated spaces. As an example, a reaction chamber, with the dimensions of a 22cm diameter and 30cm length, purifies air with an airflow rate of 5000l/min contaminated with toluene, the simulated chemical agent, and soot from a diesel engine, the simulated aerosol for biological agents. Although the airborne agents in an isolated space are eliminated to an acceptable level by the plasma flame, the decontamination of the chemical and biological agents cannot be completed without cleaning surfaces of the facilities. A simulated sterilization study of micro-organisms was carried out using the electrolyzed ozone water. The electrolyzed ozone water very effectively kills endospores of Bacillus atrophaeus (ATCC 9372) within 3min. The electrolyzed ozone water also kills the vegetative micro-organisms, fungi, and virus. The electrolyzed ozone water, after the decontamination process, disintegrates into ordinary water and oxygen without any trace of harmful materials to the environment.

One-step argon/nitrogen binary plasma jet irradiation of Li4Ti5O12 for stable high-rate lithium ion battery anodes

NASA Astrophysics Data System (ADS)

Lan, Chun-Kai; Chuang, Shang-I.; Bao, Qi; Liao, Yen-Ting; Duh, Jenq-Gong

2015-02-01

Atmospheric pressure Ar/N2 binary plasma jet irradiation has been introduced into the manufacturing process of lithium ions batteries as a facile, green and scalable post-fabrication treatment approach, which enhanced significantly the high-rate anode performance of lithium titanate (Li4Ti5O12). Main emission lines in Ar/N2 plasma measured by optical emission spectroscopy reveal that the dominant excited high-energy species in Ar/N2 plasma are N2*, N2+, N∗ and Ar∗. Sufficient oxygen vacancies have been evidenced by high resolution X-ray photoelectron spectroscopy analysis and Raman spectra. Nitrogen doping has been achieved simultaneously by the surface reaction between pristine Li4Ti5O12 particles and chemically reactive plasma species such as N∗ and N2+. The variety of Li4Ti5O12 particles on the surface of electrodes after different plasma processing time has been examined by grazing incident X-Ray diffraction. Electrochemical impedance spectra (EIS) confirm that the Ar/N2 atmospheric plasma treatment facilitates Li+ ions diffusion and reduces the internal charge-transfer resistance. The as-prepared Li4Ti5O12 anodes exhibit a superior capacity (132 mAh g-1) and excellent stability with almost no capacity decay over 100 cycles under a high C rate (10C).

Temperature estimation from molecular nitrogen UV spectra in atmospheric pressure plasmas

NASA Astrophysics Data System (ADS)

Pepper, Keenan; Kim, Yongho; Kim, Jihun

2008-11-01

Atmospheric pressure plasmas have many potential applications to fuel processing, surface treatment, and manipulation of chemical reactions. These plasmas are often non-thermal, which means different species are not in equilibrium and have different effective temperatures. This is critical for many applications because it allows high concentrations of reactive species to be produced without using a prohibitive amount of power. In the present work, numerical software was developed to estimate the vibrational and rotational temperatures (Tvib and Trot) of N2 molecules from their ultraviolet emission spectra. The electron temperature Te can also be estimated by comparing the N2 spectrum to that of the N2^+ molecular ion. This technique is applied to several plasma sources including audio frequency, RF, and microwave devices. The results are presented and their implications for practical applications are discussed.

The reaction of chlorobenzene with plasma of H2O, CO2 and CH4 obtained by an alternating-current plasma torch with a vortex stabilization

NASA Astrophysics Data System (ADS)

Surov, A. V.; Subbotin, D. I.; Obraztsov, N. V.; Popov, S. D.; Popov, V. E.; Litvyakova, A. I.; Pavlov, A. V.; Serba, E. O.; Spodobin, V. A.; Nakonechny, Gh V.

2018-01-01

This paper presents the three-phase ac plasma torch with a vortex stabilization of the arc, and two inputs of plasma environments: the electrode zone and the arc zone. Shielding gas (carbon dioxide) is supplied in the electrode zone and steam, methane and vapor of chlorobenzene are fed in the arc zone. By means of it the life time of electrodes is increased significantly. Chlorobenzene is selected, as it is the simplest aromatic chlorine-containing substance. The chemical process flows in two pathways: the formation of synthesis gas and the formation of soot. The gaseous chlorine-containing compound was only hydrogen chloride, yield of soot was 0.98% by weight of the raw materials, and the chlorine content was 2.08 wt% by the soot.

From chemicals to cold plasma: Non-thermal food processing technologies research at the USDA's Eastern Regional Research Center

USDA-ARS?s Scientific Manuscript database

Foodborne pathogens cause millions of illnesses every year. At the US Department of Agriculture’s Eastern Regional Research Center, scientists and engineers have focused on developing new ways to improve food safety and shelf life while retaining quality and nutritional value. A variety of technolog...

Effect of dual-dielectric hydrogen-diffusion barrier layers on the performance of low-temperature processed transparent InGaZnO thin-film transistors

NASA Astrophysics Data System (ADS)

Tari, Alireza; Wong, William S.

2018-02-01

Dual-dielectric SiOx/SiNx thin-film layers were used as back-channel and gate-dielectric barrier layers for bottom-gate InGaZnO (IGZO) thin-film transistors (TFTs). The concentration profiles of hydrogen, indium, gallium, and zinc oxide were analyzed using secondary-ion mass spectroscopy characterization. By implementing an effective H-diffusion barrier, the hydrogen concentration and the creation of H-induced oxygen deficiency (H-Vo complex) defects during the processing of passivated flexible IGZO TFTs were minimized. A bilayer back-channel passivation layer, consisting of electron-beam deposited SiOx on plasma-enhanced chemical vapor-deposition (PECVD) SiNx films, effectively protected the TFT active region from plasma damage and minimized changes in the chemical composition of the semiconductor layer. A dual-dielectric PECVD SiOx/PECVD SiNx gate-dielectric, using SiOx as a barrier layer, also effectively prevented out-diffusion of hydrogen atoms from the PECVD SiNx-gate dielectric to the IGZO channel layer during the device fabrication.

Deriving an explicit hepatic clearance equation accounting for plasma protein binding and hepatocellular uptake.

PubMed

Yoon, Miyoung; Clewell, Harvey J; Andersen, Melvin E

2013-02-01

High throughput in vitro biochemical and cell-based assays have the promise to provide more mechanism-based assessments of the adverse effects of large numbers of chemicals. One of the most challenging hurdles for interpreting in vitro toxicity findings is the need for reverse dosimetry tools that estimate the exposures that will give concentrations in vivo similar to the active concentrations in vitro. Recent experience using IVIVE approaches to estimate in vivo pharmacokinetics (Wetmore et al., 2012) identified the need to develop a hepatic clearance equation that explicitly accounted for a broader set of protein binding and membrane transport processes and did not depend on a well-mixed description of the liver compartment. Here we derive an explicit steady-state hepatic clearance equation that includes these factors. In addition to the derivation, we provide simple computer code to calculate steady-state extraction for any combination of blood flow, membrane transport processes and plasma protein-chemical binding rates. This expanded equation provides a tool to estimate hepatic clearance for a more diverse array of compounds. Copyright © 2012 Elsevier Ltd. All rights reserved.

Epithelial cell morphology and adhesion on diamond films deposited and chemically modified by plasma processes.

PubMed

Rezek, Bohuslav; Ukraintsev, Egor; Krátká, Marie; Taylor, Andrew; Fendrych, Frantisek; Mandys, Vaclav

2014-09-01

The authors show that nanocrystalline diamond (NCD) thin films prepared by microwave plasma enhanced chemical vapor deposition apparatus with a linear antenna delivery system are well compatible with epithelial cells (5637 human bladder carcinoma) and significantly improve the cell adhesion compared to reference glass substrates. This is attributed to better adhesion of adsorbed layers to diamond as observed by atomic force microscopy (AFM) beneath the cells. Moreover, the cell morphology can be adjusted by appropriate surface treatment of diamond by using hydrogen and oxygen plasma. Cell bodies, cytoplasmic rims, and filopodia were characterized by Peakforce AFM. Oxidized NCD films perform better than other substrates under all conditions (96% of cells adhered well). A thin adsorbed layer formed from culture medium and supplemented with fetal bovine serum (FBS) covered the diamond surface and played an important role in the cell adhesion. Nevertheless, 50-100 nm large aggregates formed from the RPMI medium without FBS facilitated cell adhesion also on hydrophobic hydrogenated NCD (increase from 23% to 61%). The authors discuss applicability for biomedical uses.

Structural and electrical characterization of microcrystalline silicon films prepared by a layer-by-layer technique with a plasma-enhanced chemical-vapor deposition system

NASA Astrophysics Data System (ADS)

Hong, J. P.; Kim, C. O.; Nahm, T. U.; Kim, C. M.

2000-02-01

Microcrystalline silicon films have been prepared on indium-coated glass utilizing a layer-by-layer technique with a plasma-enhanced chemical-vapor deposition system. The microcrystalline films were fabricated by varying the number of cycles from 10 to 60 under a fixed H2 time (t2) of 120 s, where the corresponding deposition time (t1) of amorphous silicon thin film was 60 s. Structural properties, such as the crystalline volume fraction (Xc) and grain sizes were analyzed by using Raman spectroscopy and a scanning electron microscopy. The carrier transport was characterized by the temperature dependence of dark conductivity, giving rise to the calculation of activation energy (Ea). Optical energy gaps (Eg) were also investigated using an ultraviolet spectrophotometer. In addition, the process under different hydrogen plasma time (t2) at a fixed number of 20 cycles was extensively carried out to study the dominant role of hydrogen atoms in layer-by-layer deposition. Finally, the correlation between structural and electrical properties has been discussed on the basis of experimental results.

Investigation of the rates of surface and bulk ROS-generating reactions using indigo dye as an indicator

NASA Astrophysics Data System (ADS)

Anderson, Carly; Clark, Douglas; Graves, David

2014-10-01

We present evidence for the existence of two distinct processes that contribute to the generation of reactive oxygen and nitrogen species (RONS) in liquids exposed to cold atmospheric plasma (CAP) in air. At the plasma-liquid interface, there exists a fast surface reaction zone where RONS from the gas phase interact with species in the liquid. RONS can also be produced by ``slow'' chemical reactions in the bulk liquid, even long after plasma exposure. To separate the effects of these processes, we used indigo dye as an indicator of ROS production; specifically generation of hydroxyl radical. The rate of indigo decolorization while in direct contact with CAP is compared with the expected rate of hydroxyl radical generation at the liquid surface. When added to aqueous solutions after CAP exposure, indigo dye reacts on a time scale consistent with the production of peroxynitrous acid, ONOOH, which is known to decompose to hydroxyl radical below a pH of 6.8. In this study, the CAP used was a air corona discharge plasma run in a positive streamer mode.

Effect of corona discharge plasma jet on surface-borne microorganisms and sprouting of broccoli seeds.

PubMed

Kim, Je-Wook; Puligundla, Pradeep; Mok, Chulkyoon

2017-01-01

Different pathogenic microorganisms have been reported to cause sprouts-associated outbreaks. In order to sterilise and enhance the germination of seeds, non-thermal plasma has been increasingly investigated in the field of agricultural science as an alternative to the traditional pre-sowing seed treatments. This work aimed to evaluate the effect of corona discharge plasma jet (CDPJ) on disinfection of the natural bio-contaminants of broccoli seed and also studied the plasma effect on sprout seed germination rate and physico-chemical properties of sprouts. Aerobic bacteria, moulds and yeasts, B. cereus, E. coli, Salmonella spp. were detected on the broccoli seed surface. After 0-3 min treatment using CDPJ, the detected microorganisms were reduced in the range of 1.2-2.3 log units. Inactivation patterns were better explained using pseudo-first-order kinetics. The plasma treatment of seeds up to 2 min exhibited a positive effect on germination rate, seedling growth. The physico-chemical and sensory characteristics of sprouts were unaffected due to the CDPJ treatment of their respective seeds. Corona discharge plasma jet can potentially be used for microbial decontamination of broccoli seeds. In addition, the plasma treatment of broccoli sprout seeds has enabled a significant enhancement in their germination rate and seedling growth without compromising physico-chemical and sensory characteristics of their corresponding sprouts. © 2016 Society of Chemical Industry. © 2016 Society of Chemical Industry.

Effects of the addition of blood plasma proteins on physico-chemical properties of emulsion-type pork sausage during cold storage.

PubMed

Kim, Sungho; Jin, Sangkeun; Choi, Jungseok

2017-10-01

Most slaughter blood is discarded, resulting in problems related to costs for wastewater disposal and environmental pollution. However, animal blood contains various proteins such as albumin, globulin and globin and can be used as a natural emulsifier, stabiliser and colour additive. Thus, this study was carried out to investigate the effect of blood plasma proteins on the physico-chemical properties of emulsion-type pork sausages stored at 4°C over 5 weeks. The emulsion-type pork sausages with plasma powders had higher pH than the other treatments during week 5, and higher shear force than the control (P < 0.05). The lightness values of the sausages with plasma powders were lower than the other treatments, whereas the redness and yellowness values were similar with those of the others. The sausages with plasma powders (cattle plasma powder and commercial pig plasma powder) had respectively increased texture properties. In the sensory evaluation, all proteins did not have significant impact on sensory of pork sausages. The results confirmed that plasma protein powders can be considered as a binder for the production of excellent meat products compared to other binders. © 2017 Society of Chemical Industry. © 2017 Society of Chemical Industry.

Microwave plasma chemical synthesis of nanocrystalline carbon film structures and study their properties

NASA Astrophysics Data System (ADS)

Bushuev, N.; Yafarov, R.; Timoshenkov, V.; Orlov, S.; Starykh, D.

2015-08-01

The self-organization effect of diamond nanocrystals in polymer-graphite and carbon films is detected. The carbon materials deposition was carried from ethanol vapors out at low pressure using a highly non-equilibrium microwave plasma. Deposition processes of carbon film structures (diamond, graphite, graphene) is defined. Deposition processes of nanocrystalline structures containing diamond and graphite phases in different volume ratios is identified. The solid film was obtained under different conditions of microwave plasma chemical synthesis. We investigated the electrical properties of the nanocrystalline carbon films and identified it's from various factors. Influence of diamond-graphite film deposition mode in non-equilibrium microwave plasma at low pressure on emission characteristics was established. This effect is justified using the cluster model of the structure of amorphous carbon. It was shown that the reduction of bound hydrogen in carbon structures leads to a decrease in the threshold electric field of emission from 20-30 V/m to 5 V/m. Reducing the operating voltage field emission can improve mechanical stability of the synthesized film diamond-graphite emitters. Current density emission at least 20 A/cm2 was obtained. Nanocrystalline carbon film materials can be used to create a variety of functional elements in micro- and nanoelectronics and photonics such as cold electron source for emission in vacuum devices, photonic devices, cathodoluminescent flat display, highly efficient white light sources. The obtained graphene carbon net structure (with a net size about 6 μm) may be used for the manufacture of large-area transparent electrode for solar cells and cathodoluminescent light sources

Treatment of Candida albicans biofilms with low-temperature plasma induced by dielectric barrier discharge and atmospheric pressure plasma jet

NASA Astrophysics Data System (ADS)

Koban, Ina; Matthes, Rutger; Hübner, Nils-Olaf; Welk, Alexander; Meisel, Peter; Holtfreter, Birte; Sietmann, Rabea; Kindel, Eckhard; Weltmann, Klaus-Dieter; Kramer, Axel; Kocher, Thomas

2010-07-01

Because of some disadvantages of chemical disinfection in dental practice (especially denture cleaning), we investigated the effects of physical methods on Candida albicans biofilms. For this purpose, the antifungal efficacy of three different low-temperature plasma devices (an atmospheric pressure plasma jet and two different dielectric barrier discharges (DBDs)) on Candida albicans biofilms grown on titanium discs in vitro was investigated. As positive treatment controls, we used 0.1% chlorhexidine digluconate (CHX) and 0.6% sodium hypochlorite (NaOCl). The corresponding gas streams without plasma ignition served as negative treatment controls. The efficacy of the plasma treatment was determined evaluating the number of colony-forming units (CFU) recovered from titanium discs. The plasma treatment reduced the CFU significantly compared to chemical disinfectants. While 10 min CHX or NaOCl exposure led to a CFU log10 reduction factor of 1.5, the log10 reduction factor of DBD plasma was up to 5. In conclusion, the use of low-temperature plasma is a promising physical alternative to chemical antiseptics for dental practice.

Recycling of metal bearing electronic scrap in a plasma furnace

NASA Astrophysics Data System (ADS)

Jarosz, Piotr; Małecki, Stanisław; Gargul, Krzysztof

2011-12-01

The recycling of electronic waste and the recovery of valuable components are large problems in the modern world economy. This paper presents the effects of melting sorted electronic scrap in a plasma furnace. Printed circuit boards, cables, and windings were processed separately. The characteristics of the obtained products (i.e., alloy metal, slag, dust, and gases) are presented. A method of their further processing in order to obtain commercial products is proposed. Because of the chemical composition and physical properties, the waste slag is environmentally inert and can be used for the production of abrasives. Process dusts containing large amounts of carbon and its compounds have a high calorific value. That makes it possible to use them for energy generation. The gas has a high calorific value, and its afterburning combined with energy recovery is necessary.

Responses of Solid Tumor Cells in DMEM to Reactive Oxygen Species Generated by Non-Thermal Plasma and Chemically Induced ROS Systems

PubMed Central

Kaushik, Neha; Uddin, Nizam; Sim, Geon Bo; Hong, Young June; Baik, Ku Youn; Kim, Chung Hyeok; Lee, Su Jae; Kaushik, Nagendra Kumar; Choi, Eun Ha

2015-01-01

In this study, we assessed the role of different reactive oxygen species (ROS) generated by soft jet plasma and chemical-induced ROS systems with regard to cell death in T98G, A549, HEK293 and MRC5 cell lines. For a comparison with plasma, we generated superoxide anion (O2−), hydroxyl radical (HO·), and hydrogen peroxide (H2O2) with chemicals inside an in vitro cell culture. Our data revealed that plasma decreased the viability and intracellular ATP values of cells and increased the apoptotic population via a caspase activation mechanism. Plasma altered the mitochondrial membrane potential and eventually up-regulated the mRNA expression levels of BAX, BAK1 and H2AX gene but simultaneously down-regulated the levels of Bcl-2 in solid tumor cells. Moreover, a western blot analysis confirmed that plasma also altered phosphorylated ERK1/2/MAPK protein levels. At the same time, using ROS scavengers with plasma, we observed that scavengers of HO· (mannitol) and H2O2 (catalase and sodium pyruvate) attenuated the activity of plasma on cells to a large extent. In contrast, radicals generated by specific chemical systems enhanced cell death drastically in cancer as well as normal cell lines in a dose-dependent fashion but not specific with regard to the cell type as compared to plasma. PMID:25715710

Responses of Solid Tumor Cells in DMEM to Reactive Oxygen Species Generated by Non-Thermal Plasma and Chemically Induced ROS Systems

NASA Astrophysics Data System (ADS)

Kaushik, Neha; Uddin, Nizam; Sim, Geon Bo; Hong, Young June; Baik, Ku Youn; Kim, Chung Hyeok; Lee, Su Jae; Kaushik, Nagendra Kumar; Choi, Eun Ha

2015-02-01

In this study, we assessed the role of different reactive oxygen species (ROS) generated by soft jet plasma and chemical-induced ROS systems with regard to cell death in T98G, A549, HEK293 and MRC5 cell lines. For a comparison with plasma, we generated superoxide anion (O2-), hydroxyl radical (HO.), and hydrogen peroxide (H2O2) with chemicals inside an in vitro cell culture. Our data revealed that plasma decreased the viability and intracellular ATP values of cells and increased the apoptotic population via a caspase activation mechanism. Plasma altered the mitochondrial membrane potential and eventually up-regulated the mRNA expression levels of BAX, BAK1 and H2AX gene but simultaneously down-regulated the levels of Bcl-2 in solid tumor cells. Moreover, a western blot analysis confirmed that plasma also altered phosphorylated ERK1/2/MAPK protein levels. At the same time, using ROS scavengers with plasma, we observed that scavengers of HO. (mannitol) and H2O2 (catalase and sodium pyruvate) attenuated the activity of plasma on cells to a large extent. In contrast, radicals generated by specific chemical systems enhanced cell death drastically in cancer as well as normal cell lines in a dose-dependent fashion but not specific with regard to the cell type as compared to plasma.

Free Radicals in Chemical Biology: from Chemical Behavior to Biomarker Development

PubMed Central

Chatgilialoglu, Chryssostomos; Ferreri, Carla; Masi, Annalisa; Melchiorre, Michele; Sansone, Anna; Terzidis, Michael A.; Torreggiani, Armida

2013-01-01

The involvement of free radicals in life sciences has constantly increased with time and has been connected to several physiological and pathological processes. This subject embraces diverse scientific areas, spanning from physical, biological and bioorganic chemistry to biology and medicine, with applications to the amelioration of quality of life, health and aging. Multidisciplinary skills are required for the full investigation of the many facets of radical processes in the biological environment and chemical knowledge plays a crucial role in unveiling basic processes and mechanisms. We developed a chemical biology approach able to connect free radical chemical reactivity with biological processes, providing information on the mechanistic pathways and products. The core of this approach is the design of biomimetic models to study biomolecule behavior (lipids, nucleic acids and proteins) in aqueous systems, obtaining insights of the reaction pathways as well as building up molecular libraries of the free radical reaction products. This context can be successfully used for biomarker discovery and examples are provided with two classes of compounds: mono-trans isomers of cholesteryl esters, which are synthesized and used as references for detection in human plasma, and purine 5',8-cyclo-2'-deoxyribonucleosides, prepared and used as reference in the protocol for detection of such lesions in DNA samples, after ionizing radiations or obtained from different health conditions. PMID:23629513

Application of protein expression profiling to screen chemicals for androgenic activity.

PubMed

Hemmer, Michael J; Salinas, Kimberly A; Harris, Peggy S

2011-05-01

Protein expression changes can be used for detection of biomarkers that can be applied diagnostically to screen chemicals for endocrine modifying activity. In this study, surface enhanced laser desorption/ionization time-of-flight mass spectrometry (SELDI-TOF-MS) coupled with a short term fish assay was used to investigate changes in plasma protein expression as a means to screen chemicals for androgenic activity. Adult gravid female sheepshead minnows (Cyprinodon variegatus) were placed into separate aquaria for seawater control, ethanol solvent control, and the following androgen agonist treatments at 5.0μg/L: dihydrotestosterone (DHT), methyldihydrotestosterone (MDHT), testosterone (T), methyltestosterone (MT) and trenbolone (TB). Treatments of 0.6μg/L endosulfan and 40μg/L chlorpyrifos (CP) served as non-androgenic negative stressor controls. Test concentrations were maintained using an intermittent flow-through dosing apparatus supplying exposure water at 20L/h. Fish were sampled at 7 days, the plasma diluted, processed on weak cation exchange CM10 ProteinChip arrays and analyzed. Spectral processing resulted in 249 individual m/z peak clusters for the androgen exposed fish. Partial least squares-discriminant analysis was used to develop an androgen-responsive model using sample spectra from exposures with DHT and unexposed solvent control fish as the training set. The androgen classification model performed with ≥79% specificity (% true negative) and ≥70% sensitivity (% true positive) for non-aromatizable androgens. The aromatizable androgens T and MT were classified as androgenic with specificities of 42 and 79%, respectively. The reduction in sensitivity observed with T is thought to be caused by its metabolic conversion to an estrogen by aromatase. The results of these studies show diagnostic plasma protein expression models can correctly classify chemicals by their androgenic activity using a combination of high throughput mass spectrometry and multivariate approaches. Published by Elsevier B.V.

Chemical kinetics as a contract sport

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kolb, C.E.

1990-01-01

Earlier in this century chemical kinetics was a basic physical chemistry research topic widely pursued in leading academic chemistry departments. Chemical kinetics now appears to be a discipline practiced chiefly for its applications to societal problems. The chemical kinetics activities directed by D.M. Golden at SRI International are strikingly successful in generating data for key applied problems while at the same time advancing our understanding of chemical kinetics as a scientific discipline. In this talk, the author will contrast the chemical kinetics activities in two contract R D laboratories, one on the right side of the U.S. (ARI) and themore » other on the left (SRI). Their approach to common applied problems ranging from stratospheric heterogeneous kinetics to plasma etching systems for semiconductor processing will be compared and contrasted. Empirically discovered Golden Rules for the pursuit of quality chemical kinetics research in a contract R D environment will be presented and discussed.« less

Spectroscopic analysis technique for arc-welding process control

NASA Astrophysics Data System (ADS)

Mirapeix, Jesús; Cobo, Adolfo; Conde, Olga; Quintela, María Ángeles; López-Higuera, José-Miguel

2005-09-01

The spectroscopic analysis of the light emitted by thermal plasmas has found many applications, from chemical analysis to monitoring and control of industrial processes. Particularly, it has been demonstrated that the analysis of the thermal plasma generated during arc or laser welding can supply information about the process and, thus, about the quality of the weld. In some critical applications (e.g. the aerospace sector), an early, real-time detection of defects in the weld seam (oxidation, porosity, lack of penetration, ...) is highly desirable as it can reduce expensive non-destructive testing (NDT). Among others techniques, full spectroscopic analysis of the plasma emission is known to offer rich information about the process itself, but it is also very demanding in terms of real-time implementations. In this paper, we proposed a technique for the analysis of the plasma emission spectrum that is able to detect, in real-time, changes in the process parameters that could lead to the formation of defects in the weld seam. It is based on the estimation of the electronic temperature of the plasma through the analysis of the emission peaks from multiple atomic species. Unlike traditional techniques, which usually involve peak fitting to Voigt functions using the Levenberg-Marquardt recursive method, we employ the LPO (Linear Phase Operator) sub-pixel algorithm to accurately estimate the central wavelength of the peaks (allowing an automatic identification of each atomic species) and cubic-spline interpolation of the noisy data to obtain the intensity and width of the peaks. Experimental tests on TIG-welding using fiber-optic capture of light and a low-cost CCD-based spectrometer, show that some typical defects can be easily detected and identified with this technique, whose typical processing time for multiple peak analysis is less than 20msec. running in a conventional PC.

Plasma-assisted synthesis of MoS2

NASA Astrophysics Data System (ADS)

Campbell, Philip M.; Perini, Christopher J.; Chiu, Johannes; Gupta, Atul; Ray, Hunter S.; Chen, Hang; Wenzel, Kevin; Snyder, Eric; Wagner, Brent K.; Ready, Jud; Vogel, Eric M.

2018-03-01

There has been significant interest in transition metal dichalcogenides (TMDs), including MoS2, in recent years due to their potential application in novel electronic and optical devices. While synthesis methods have been developed for large-area films of MoS2, many of these techniques require synthesis temperatures of 800 °C or higher. As a result of the thermal budget, direct synthesis requiring high temperatures is incompatible with many integrated circuit processes as well as flexible substrates. This work explores several methods of plasma-assisted synthesis of MoS2 as a way to lower the synthesis temperature. The first approach used is conversion of a naturally oxidized molybdenum thin film to MoS2 using H2S plasma. Conversion is demonstrated at temperatures as low as 400 °C, and the conversion is enabled by hydrogen radicals which reduce the oxidized molybdenum films. The second method is a vapor phase reaction incorporating thermally evaporated MoO3 exposed to a direct H2S plasma, similar to chemical vapor deposition (CVD) synthesis of MoS2. Synthesis at 400 °C results in formation of super-stoichiometric MoS2 in a beam-interrupted growth process. A final growth method relies on a cyclical process in which a small amount of Mo is sputtered onto the substrate and is subsequently sulfurized in a H2S plasma. Similar results could be realized using an atomic layer deposition (ALD) process to deposit the Mo film. Compared to high temperature synthesis methods, the lower temperature samples are lower quality, potentially due to poor crystallinity or higher defect density in the films. Temperature-dependent conductivity measurements are consistent with hopping conduction in the plasma-assisted synthetic MoS2, suggesting a high degree of disorder in the low-temperature films. Optimization of the plasma-assisted synthesis process for slower growth rate and better stoichiometry is expected to lead to high quality films at low growth temperature.

In Situ Nanocalorimetric Investigations of Plasma Assisted Deposited Poly(ethylene oxide)-like Films by Specific Heat Spectroscopy.

PubMed

Madkou, Sherif; Melnichu, Iurii; Choukourov, Andrei; Krakovsky, Ivan; Biederman, Hynek; Schönhals, Andreas

2016-04-28

In recent years, highly cross-linked plasma polymers have started to unveil their potential in numerous biomedical applications in thin-film form. However, conventional diagnostic methods often fail due to their diverse molecular dynamics conformations. Here, glassy dynamics and the melting transition of thin PEO-like plasma assisted deposited (ppPEO) films (thickness 100 nm) were in situ studied by a combination of specific heat spectroscopy, utilizing a pJ/K sensitive ac-calorimeter chip, and composition analytical techniques. Different cross-linking densities were obtained by different plasma powers during the deposition of the films. Glassy dynamics were observed for all values of the plasma power. It was found that the glassy dynamics slows down with increasing the plasma power. Moreover, the underlying relaxation time spectra broaden indicating that the molecular motions become more heterogeneous with increasing plasma power. In a second set of the experiment, the melting behavior of the ppPEO films was studied. The melting temperature of ppPEO was found to decrease with increasing plasma power. This was explained by a decrease of the order in the crystals due to formation of chemical defects during the plasma process.

Nanocarbon materials fabricated using plasmas

NASA Astrophysics Data System (ADS)

Hatakeyama, Rikizo

2017-12-01

Since the discovery of fullerenes more than three decades ago, new kinds of nanoscale materials of carbon allotropes called "nanocarbons" have so far been discovered or synthesized at successive intervals as cases such as carbon nanotubes, carbon nanohorns, graphene, carbon nanowalls, and a carbon nanobelt, while nanodiamonds were actually discovered before then. Their attractively excellent mechanical, physical, and chemical properties have driven researchers to continuously create one of the hottest frontiers in materials science and technology. While plasma states have often been involved in their discovery, on the other hand, plasma-based approaches to this exciting field originally hold promising and enormous potentials for advancing and expanding industrial/biomedical applications of nanocarbons of great diversity. This article provides an extensive overview on plasma-fabricated nanocarbon materials, where the term "fabrication" is defined as synthesis, functionalization, and assembly of devices to cover a wide range of issues associated with the step-by-step plasma processes. Specific attention has been paid to the comparative examination between plasma-based and non-plasma methods for fabricating the nanocarobons with an emphasis on the advantages of plasma processing, such as low-temperature/large-scale fabrication and diversity-carrying structure controllability. The review ends with current challenges and prospects including a ripple effect of the nanocarbon studies on the development of related novel nanomaterials such as transition metal dichalcogenides. It contains not only the latest progress in the field for cutting-edge scientists and engineers, but also the introductory guidance to non-specialists such as lower-class graduate students.

Development of atmospheric pressure large area plasma jet for sterilisation and investigation of molecule and plasma interaction

NASA Astrophysics Data System (ADS)

Zerbe, Kristina; Iberler, Marcus; Jacoby, Joachim; Wagner, Christopher

2016-09-01

The intention of the project is the development and improvement of an atmospheric plasma jet based on various discharge forms (e.g. DBD, RF, micro-array) for sterilisation of biomedical equipment and investigation of biomolecules under the influence of plasma stress. The major objective is to design a plasma jet with a large area and an extended length. Due to the success on small scale plasma sterilisation the request of large area plasma has increased. Many applications of chemical disinfection in environmental and medical cleaning could thereby be complemented. Subsequently, the interaction between plasma and biomolecules should be investigated to improve plasma strerilisation. Special interest will be on non equilibrium plasma electrons affecting the chemical bindings of organic molecules.

Production of coloured glass-ceramics from incinerator ash using thermal plasma technology.

PubMed

Cheng, T W; Huang, M Z; Tzeng, C C; Cheng, K B; Ueng, T H

2007-08-01

Incineration is a major treatment process for municipal solid waste in Taiwan. It is estimated that over 1.5 Mt of incinerator ash are produced annually. This study proposes using thermal plasma technology to treat incinerator ash. Sintered glass-ceramics were produced using quenched vitrified slag with colouring agents added. The experimental results showed that the major crystalline phases developed in the sintered glass-ceramics were gehlenite and wollastonite, but many other secondary phases also appeared depending on the colouring agents added. The physical/mechanical properties, chemical resistance and toxicity characteristic leaching procedure of the coloured glass-ceramics were satisfactory. The glass-ceramic products obtained from incinerator ash treated with thermal plasma technology have great potential for building applications.

Spark plasma sintering of pure and doped tungsten as plasma facing material

NASA Astrophysics Data System (ADS)

Autissier, E.; Richou, M.; Minier, L.; Naimi, F.; Pintsuk, G.; Bernard, F.

2014-04-01

In the current water cooled divertor concept, tungsten is an armour material and CuCrZr is a structural material. In this work, a fabrication route via a powder metallurgy process such as spark plasma sintering is proposed to fully control the microstructure of W and W composites. The effect of chemical composition (additives) and the powder grain size was investigated. To reduce the sintering temperature, W powders doped with a nano-oxide dispersion of Y2O3 are used. Consequently, the sintering temperature for W-oxide dispersed strengthened (1800 °C) is lower than for pure W powder. Edge localized mode tests were performed on pure W and compared to other preparation techniques and showed promising results.

Controlled synthesis of germanium nanoparticles by nonthermal plasmas

NASA Astrophysics Data System (ADS)

Ahadi, Amir Mohammad; Hunter, Katharine I.; Kramer, Nicolaas J.; Strunskus, Thomas; Kersten, Holger; Faupel, Franz; Kortshagen, Uwe R.

2016-02-01

The size, composition, and crystallinity of plasma produced nanoparticles are crucial factors for their physical and chemical properties. Here, we investigate the role of the process gas composition, particularly the hydrogen (H2) flow rate, on germanium (Ge) nanoparticles synthesized from a chlorinated precursor by nonthermal plasma. We demonstrate that the gas composition can significantly change the nanoparticle size and also adjust the surface chemistry by altering the dominant reaction mechanisms. A red shift of the Ge-Clx infrared absorptions with increasing H2 flow indicates a weakening of the Ge-Clx bonds at high H2 content. Furthermore, by changing the gas composition, the nanoparticles microstructure can be controlled from mostly amorphous at high hydrogen flow to diamond cubic crystalline at low hydrogen flow.

More vertical etch profile using a Faraday cage in plasma etching

NASA Astrophysics Data System (ADS)

Cho, Byeong-Ok; Hwang, Sung-Wook; Ryu, Jung-Hyun; Moon, Sang Heup

1999-05-01

Scanning electron microscope images of sidewalls obtained by plasma etching of an SiO2 film with and without a Faraday cage have been compared. When the substrate film is etched in the Faraday cage, faceting is effectively suppressed and the etch profile becomes more vertical regardless of the process conditions. This is because the electric potential in the cage is nearly uniform and therefore distortion of the electric field at the convex corner of a microfeature is prevented. The most vertical etch profile is obtained when the cage is used in fluorocarbon plasmas, where faceting is further suppressed due to the decrease in the chemical sputtering yield and the increase in the radical/ion flux on the substrate.

Comparison of Physical-chemical and Mechanical Properties of Chlorapatite and Hydroxyapatite Plasma Sprayed Coatings

PubMed Central

Demnati, Imane; Grossin, David; Marsan, Olivier; Bertrand, Ghislaine; Collonges, Gérard; Combes, Christèle; Parco, Maria; Braceras, Inigo; Alexis, Joel; Balcaen, Yannick; Rey, Christian

2015-01-01

Chlorapatite can be considered a potential biomaterial for orthopaedic applications. Its use as plasma-sprayed coating could be of interest considering its thermal properties and particularly its ability to melt without decomposition unlike hydroxyapatite. Chlorapatite (ClA) was synthesized by a high-temperature ion exchange reaction starting from commercial stoichiometric hydroxyapatites (HA). The ClA powder showed similar characteristics as the original industrial HA powder, and was obtained in the monoclinic form. The HA and ClA powders were plasma-sprayed using a low-energy plasma spraying system with identical processing parameters. The coatings were characterized by physical-chemical methods, i.e. X-ray diffraction (XRD), Fourier transform infrared spectroscopy (FTIR) and Raman spectroscopy, including distribution mapping of the main phases detected such as amorphous calcium phosphate (ACP), oxyapatite (OA), and HA or ClA. The unexpected formation of oxyapatite in ClA coatings was assigned to a side reaction with contaminating oxygenated species (O2, H2O). ClA coatings exhibited characteristics different from HA, showing a lower content of oxyapatite and amorphous phase. Although their adhesion strength was found to be lower than that of HA coatings, their application could be an interesting alternative, offering, in particular, a larger range of spraying conditions without formation of massive impurities. PMID:25893015

Surface composition XPS analysis of a plasma treated polystyrene: Evolution over long storage periods.

PubMed

Ba, Ousmane M; Marmey, Pascal; Anselme, Karine; Duncan, Anthony C; Ponche, Arnaud

2016-09-01

A polystyrene surface (PS) was initially treated by cold nitrogen and oxygen plasma in order to incorporate in particular amine and hydroxyl functions, respectively. The evolution of the chemical nature of the surface was further monitored over a long time period (580 days) by chemical assay, XPS and contact angle measurements. Surface density quantification of primary amine groups was performed using three chemical amine assays: 4-nitrobenzaldehyde (4-NBZ), Sulfo succinimidyl 6-[3'(2 pyridyldithio)-pionamido] hexanoate (Sulfo-LC-SPDP) and iminothiolane (ITL). The results showed amine densities were in the range of 2 per square nanometer (comparable to the results described in the literature) after 5min of nitrogen plasma treatment. Over the time period investigated, chemical assays, XPS and contact angles suggest a drastic significant evolution of the chemical nature of the surface within the first two weeks. Beyond that time period and up to almost two years, nitrogen plasma modified substrates exhibits a slow and continuous oxidation whereas oxygen plasma modifed polystyrene surface is chemically stable after two weeks of storage. The latter appeared to "ease of" showing relatively mild changes within the one year period. Our results suggest that it may be preferable to wait for a chemical "stabilization" period of two weeks before subsequent covalent immobilization of proteins onto the surface. The originality of this work resides in the study of the plasma treated surface chemistry evolution over long periods of storage time (580 days) considerably exceeding those described in the literature. Copyright © 2016 Elsevier B.V. All rights reserved.

Analysis of non-equilibrium phenomena in inductively coupled plasma generators

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zhang, W.; Panesi, M., E-mail: mpanesi@illinois.edu; Lani, A.

This work addresses the modeling of non-equilibrium phenomena in inductively coupled plasma discharges. In the proposed computational model, the electromagnetic induction equation is solved together with the set of Navier-Stokes equations in order to compute the electromagnetic and flow fields, accounting for their mutual interaction. Semi-classical statistical thermodynamics is used to determine the plasma thermodynamic properties, while transport properties are obtained from kinetic principles, with the method of Chapman and Enskog. Particle ambipolar diffusive fluxes are found by solving the Stefan-Maxwell equations with a simple iterative method. Two physico-mathematical formulations are used to model the chemical reaction processes: (1) Amore » Local Thermodynamics Equilibrium (LTE) formulation and (2) a thermo-chemical non-equilibrium (TCNEQ) formulation. In the TCNEQ model, thermal non-equilibrium between the translational energy mode of the gas and the vibrational energy mode of individual molecules is accounted for. The electronic states of the chemical species are assumed in equilibrium with the vibrational temperature, whereas the rotational energy mode is assumed to be equilibrated with translation. Three different physical models are used to account for the coupling of chemistry and energy transfer processes. Numerical simulations obtained with the LTE and TCNEQ formulations are used to characterize the extent of non-equilibrium of the flow inside the Plasmatron facility at the von Karman Institute. Each model was tested using different kinetic mechanisms to assess the sensitivity of the results to variations in the reaction parameters. A comparison of temperatures and composition profiles at the outlet of the torch demonstrates that the flow is in non-equilibrium for operating conditions characterized by pressures below 30 000 Pa, frequency 0.37 MHz, input power 80 kW, and mass flow 8 g/s.« less

Analysis of non-equilibrium phenomena in inductively coupled plasma generators

NASA Astrophysics Data System (ADS)

Zhang, W.; Lani, A.; Panesi, M.

2016-07-01

This work addresses the modeling of non-equilibrium phenomena in inductively coupled plasma discharges. In the proposed computational model, the electromagnetic induction equation is solved together with the set of Navier-Stokes equations in order to compute the electromagnetic and flow fields, accounting for their mutual interaction. Semi-classical statistical thermodynamics is used to determine the plasma thermodynamic properties, while transport properties are obtained from kinetic principles, with the method of Chapman and Enskog. Particle ambipolar diffusive fluxes are found by solving the Stefan-Maxwell equations with a simple iterative method. Two physico-mathematical formulations are used to model the chemical reaction processes: (1) A Local Thermodynamics Equilibrium (LTE) formulation and (2) a thermo-chemical non-equilibrium (TCNEQ) formulation. In the TCNEQ model, thermal non-equilibrium between the translational energy mode of the gas and the vibrational energy mode of individual molecules is accounted for. The electronic states of the chemical species are assumed in equilibrium with the vibrational temperature, whereas the rotational energy mode is assumed to be equilibrated with translation. Three different physical models are used to account for the coupling of chemistry and energy transfer processes. Numerical simulations obtained with the LTE and TCNEQ formulations are used to characterize the extent of non-equilibrium of the flow inside the Plasmatron facility at the von Karman Institute. Each model was tested using different kinetic mechanisms to assess the sensitivity of the results to variations in the reaction parameters. A comparison of temperatures and composition profiles at the outlet of the torch demonstrates that the flow is in non-equilibrium for operating conditions characterized by pressures below 30 000 Pa, frequency 0.37 MHz, input power 80 kW, and mass flow 8 g/s.

Study of plasma-chemical NO-containing gas flow for treatment of wounds and inflammatory processes.

PubMed

Pekshev, Alexander V; Shekhter, Anatoly B; Vagapov, Andrey B; Sharapov, Nikolay A; Vanin, Anatoly F

2018-02-28

This work is aimed at exhaustive and detailed study of chemical, physical and physico-chemical characteristics of NO-containing gas flow (NO-CGF) generated by a plasma-chemical generator of Plason device, which has been used in medical practice for more than 15 years for effectively healing wound and inflammatory conditions with exogenous nitric oxide (NO-therapy). Data was obtained on spatial structure of the gas flow, and values of its local parameters in axial and radial directions, such as nitric oxide content, velocity, temperature and mass flow density of nitric oxide, providing altogether the effectiveness of treatment by the exogenous NO-therapy method, were determined experimentally and by computations. It was demonstrated that plasma-chemical synthesis of NO from atmospheric air in a low direct current (DC) arc provides a high mass flow of nitric oxide at the level of 1.6-1.8 mg/s, while in the area of impact of NO-CGF on the biological tissue, on its axis, NO content is 400-600 ppm, flow velocity about 5 m/s, nitric oxide mass flow density 0.25-0.40 mg/(s·cm 2 ), temperature 40-60 °C. Tendencies were determined for designing new devices for further experimental biological and medical research in the field of NO-therapy: lowering the temperature of NO-CGF to ambient temperature will enable variation, in experiments, of the affecting flow parameters in a wide range up to their maximum values: NO content up to 2000 ppm, velocity up to 20 m/s, nitric oxide mass flow density up to 2.5 mg/(s·cm 2 ). Copyright © 2017. Published by Elsevier Inc.

Electron molecular ion recombination: product excitation and fragmentation.

PubMed

Adams, Nigel G; Poterya, Viktoriya; Babcock, Lucia M

2006-01-01

Electron-ion dissociative recombination is an important ionization loss process in any ionized gas containing molecular ions. This includes the interstellar medium, circumstellar shells, cometary comae, planetary ionospheres, fusion plasma boundaries, combustion flames, laser plasmas and chemical deposition and etching plasmas. In addition to controlling the ionization density, the process generates many radical species, which can contribute to a parallel neutral chemistry. Techniques used to obtain rate data and product information (flowing afterglows and storage rings) are discussed and recent data are reviewed including diatomic to polyatomic ions and cluster ions. The data are divided into rate coefficients and cross sections, including their temperature/energy dependencies, and quantitative identification of neutral reaction products. The latter involve both ground and electronically excited states and including vibrational excitation. The data from the different techniques are compared and trends in the data are examined. The reactions are considered in terms of the basic mechanisms (direct and indirect processes including tunneling) and recent theoretical developments are discussed. Finally, new techniques are mentioned (for product identification; electrostatic storage rings, including single and double rings; Coulomb explosion) and new ways forward are suggested.

Capillary plasma jet: A low volume plasma source for life science applications

NASA Astrophysics Data System (ADS)

Topala, I.; Nagatsu, M.

2015-02-01

In this letter, we present results from multispectroscopic analysis of protein films, after exposure to a peculiar plasma source, i.e., the capillary plasma jet. This plasma source is able to generate very small pulsed plasma volumes, in kilohertz range, with characteristic dimensions smaller than 1 mm. This leads to specific microscale generation and transport of all plasma species. Plasma diagnosis was realized using general electrical and optical methods. Depending on power level and exposure duration, this miniature plasma jet can induce controllable modifications to soft matter targets. Detailed discussions on protein film oxidation and chemical etching are supported by results from absorption, X-ray photoelectron spectroscopy, and microscopy techniques. Further exploitation of principles presented here may consolidate research interests involving plasmas in biotechnologies and plasma medicine, especially in patterning technologies, modified biomolecule arrays, and local chemical functionalization.

Process technologies of MPACVD planar waveguide devices and fiber attachment

NASA Astrophysics Data System (ADS)

Li, Cheng-Chung; Qian, Fan; Boudreau, Robert A.; Rowlette, John R., Sr.; Bowen, Terry P.

1999-03-01

Optical circuits based on low-loss glass waveguide on silicon are a practical and promising approach to integrate different functional components. Fiber attachment to planar waveguide provides a practical application for optical communications. Microwave Plasma Assisted Chemical Vapor Deposition (MPACVD) produces superior quality, low birefringence, low-loss, planar waveguides for integrated optical devices. Microwave plasma initiates the chemical vapor of SiCl4, GeCl4 and oxygen. A Ge-doped silica layer is thus deposited with a compatible high growth rate (i.e. 0.4 - 0.5 micrometer/min). Film properties are based on various parameters, such as chemical flow rates, chamber pressure and temperature, power level and injector design. The resultant refractive index can be varied between 1.46 (i.e. pure silica) and 1.60 (i.e. pure germania). Waveguides can be fabricated with any desired refractive index profile. Standard photolithography defines the waveguide pattern on a mask layer. The core layer is removed by plasma dry etch which has been investigated by both reactive ion etch (RIE) and inductively coupled plasma (ICP) etch. Etch rates of 3000 - 4000 angstrom/min have been achieved using ICP compared to typical etch rates of 200 - 300 angstrom/min using conventional RIE. Planar waveguides offer good mode matching to optical fiber. A polished fiber end can be glued to the end facet of waveguide with a very low optical coupling loss. In addition, anisotropic etching of silicon V- grooves provides a passive alignment capability. Epoxy and solder were used to fix the fiber within the guiding groove. Several designs of waveguide-fiber attachment will be discussed.

Real time closed loop control of an Ar and Ar/O2 plasma in an ICP

NASA Astrophysics Data System (ADS)

Faulkner, R.; Soberón, F.; McCarter, A.; Gahan, D.; Karkari, S.; Milosavljevic, V.; Hayden, C.; Islyaikin, A.; Law, V. J.; Hopkins, M. B.; Keville, B.; Iordanov, P.; Doherty, S.; Ringwood, J. V.

2006-10-01

Real time closed loop control for plasma assisted semiconductor manufacturing has been the subject of academic research for over a decade. However, due to process complexity and the lack of suitable real time metrology, progress has been elusive and genuine real time, multi-input, multi-output (MIMO) control of a plasma assisted process has yet to be successfully implemented in an industrial setting. A Splasma parameter control strategy T is required to be adopted whereby process recipes which are defined in terms of plasma properties such as critical species densities as opposed to input variables such as rf power and gas flow rates may be transferable between different chamber types. While PIC simulations and multidimensional fluid models have contributed considerably to the basic understanding of plasmas and the design of process equipment, such models require a large amount of processing time and are hence unsuitable for testing control algorithms. In contrast, linear dynamical empirical models, obtained through system identification techniques are ideal in some respects for control design since their computational requirements are comparatively small and their structure facilitates the application of classical control design techniques. However, such models provide little process insight and are specific to an operating point of a particular machine. An ideal first principles-based, control-oriented model would exhibit the simplicity and computational requirements of an empirical model and, in addition, despite sacrificing first principles detail, capture enough of the essential physics and chemistry of the process in order to provide reasonably accurate qualitative predictions. This paper will discuss the development of such a first-principles based, control-oriented model of a laboratory inductively coupled plasma chamber. The model consists of a global model of the chemical kinetics coupled to an analytical model of power deposition. Dynamics of actuators including mass flow controllers and exhaust throttle are included and sensor characteristics are also modelled. The application of this control-oriented model to achieve multivariable closed loop control of specific species e.g. atomic Oxygen and ion density using the actuators rf power, Oxygen and Argon flow rates, and pressure/exhaust flow rate in an Ar/O2 ICP plasma will be presented.

Plasma flame for mass purification of contaminated air with chemical and biological warfare agents

NASA Astrophysics Data System (ADS)

Uhm, Han S.; Shin, Dong H.; Hong, Yong C.

2006-09-01

An elimination of airborne simulated chemical and biological warfare agents was carried out by making use of a plasma flame made of atmospheric plasma and a fuel-burning flame, which can purify the interior air of a large volume in isolated spaces such as buildings, public transportation systems, and military vehicles. The plasma flame generator consists of a microwave plasma torch connected in series to a fuel injector and a reaction chamber. For example, a reaction chamber, with the dimensions of a 22cm diameter and 30cm length, purifies an airflow rate of 5000lpm contaminated with toluene (the simulated chemical agent) and soot from a diesel engine (the simulated aerosol for biological agents). Large volumes of purification by the plasma flame will free mankind from the threat of airborne warfare agents. The plasma flame may also effectively purify air that is contaminated with volatile organic compounds, in addition to eliminating soot from diesel engines as an environmental application.

Small unilamellar liposomes as a membrane model for cell inactivation by cold atmospheric plasma treatment

NASA Astrophysics Data System (ADS)

Maheux, S.; Frache, G.; Thomann, J. S.; Clément, F.; Penny, C.; Belmonte, T.; Duday, D.

2016-09-01

Cold atmospheric plasma is thought to be a promising tool for numerous biomedical applications due to its ability to generate a large diversity of reactive species in a controlled way. In some cases, it can also generate pulsed electric fields at the zone of treatment, which can induce processes such as electroporation in cell membranes. However, the interaction of these reactive species and the pulse electric field with cells in a physiological medium is very complex, and we still need a better understanding in order to be useful for future applications. A way to reach this goal is to work with model cell membranes such as liposomes, with the simplest physiological liquid and in a controlled atmosphere in order to limit the number of parallel reactions and processes. In this paper, where this approach has been chosen, 1,2-Dioleoyl-sn-glycero-3-phosphocholine (DOPC) small unilamellar vesicles (SUV) have been synthesized in a phosphate buffered aqueous solution, and this solution has been treated by a nanosecond pulsed plasma jet under a pure nitrogen atmosphere. It is only the composition of the plasma gas that has been changed in order to generate different cocktails of reactive species. After the quantification of the main plasma reactive species in the phosphate buffered saline (PBS) solution, structural, surface charge state, and chemical modifications generated on the plasma treated liposomes, due to the interaction with the plasma reactive species, have been carefully characterized. These results allow us to further understand the effect of plasma reactive species on model cell membranes in physiological liquids. The permeation through the liposomal membrane and the reaction of plasma reactive species with molecules encapsulated inside the liposomes have also been evaluated. New processes of degradation are finally presented and discussed, which come from the specific conditions of plasma treatment under the pure nitrogen atmosphere.

Physical vs. photolithographic patterning of plasma polymers: an investigation by ToF-SSIMS and multivariate analysis

PubMed Central

Mishra, Gautam; Easton, Christopher D.; McArthur, Sally L.

2009-01-01

Physical and photolithographic techniques are commonly used to create chemical patterns for a range of technologies including cell culture studies, bioarrays and other biomedical applications. In this paper, we describe the fabrication of chemical micropatterns from commonly used plasma polymers. Atomic force microcopy (AFM) imaging, Time-of-Flight Static Secondary Ion Mass Spectrometry (ToF-SSIMS) imaging and multivariate analysis have been employed to visualize the chemical boundaries created by these patterning techniques and assess the spatial and chemical resolution of the patterns. ToF-SSIMS analysis demonstrated that well defined chemical and spatial boundaries were obtained from photolithographic patterning, while the resolution of physical patterning via a transmission electron microscopy (TEM) grid varied depending on the properties of the plasma system including the substrate material. In general, physical masking allowed diffusion of the plasma species below the mask and bleeding of the surface chemistries. Multivariate analysis techniques including Principal Component Analysis (PCA) and Region of Interest (ROI) assessment were used to investigate the ToF-SSIMS images of a range of different plasma polymer patterns. In the most challenging case, where two strongly reacting polymers, allylamine and acrylic acid were deposited, PCA confirmed the fabrication of micropatterns with defined spatial resolution. ROI analysis allowed for the identification of an interface between the two plasma polymers for patterns fabricated using the photolithographic technique which has been previously overlooked. This study clearly demonstrated the versatility of photolithographic patterning for the production of multichemistry plasma polymer arrays and highlighted the need for complimentary characterization and analytical techniques during the fabrication plasma polymer micropatterns. PMID:19950941

Characterization and Surface Treatment of Materials Used in MADEAL S.A. Industry Productive Process of Rims by Plasma Assisted Repetitive Pulsed Arcs Technique

NASA Astrophysics Data System (ADS)

Jiménez, H.; Salazar, V. H.; Devia, A.; Jaramillo, S.; Velez, G.

2006-12-01

A study of materials used in the molds production to aluminium rims manufacture in the MADEAL S.A. factory was carried out for apply a plasma assisted surface treatment consists in growing TiAlN hard coatings that it protects this molds in the productive process. This coating resists high oxidation temperatures, of the other of 800 °C, high hardness (2800 Vickers) and low friction coefficient. A plasma assisted repetitive pulsed arcs mono-evaporator system was used in the grow of the TiAlN coatings, the TiAlN target is a sinterized 50% Ti and 50% Al, in the substrate they were used two types of steel that compose the molds injection pieces for the rims production. These materials were subjected to linear and fluctuating thermal changes in the Bruker axs X-Ray diffractometer temperature chamber, what simulated the molds thermal variation in the rims production process and they were compared with TiAlN coatings subjected to same thermal changes. The Materials characterization, before and later of thermal process, was carried out using XRD, SPM and EDS techniques, to analyze the crystallographic, topographic and chemical surface structure behaviours.

Environmental and economic vision of plasma treatment of waste in Makkah

NASA Astrophysics Data System (ADS)

Galaly, Ahmed Rida; van Oost, Guido

2017-10-01

An environmental and economic assessment of the development of a plasma-chemical reactor equipped with plasma torches for the environmentally friendly treatment of waste streams by plasma is outlined with a view to the chemical and energetic valorization of the sustainability in the Kingdom of Saudi Arabia (KSA). This is especially applicable in the pilgrimage season in the city of Makkah, which is a major challenge since the amount of waste was estimated at about 750 thousand tons through Arabic Year 1435H (2015), and is growing at a rate of 3%-5% annually. According to statistics, the value of waste in Saudi Arabia ranges between 8 and 9 billion EUR. The Plasma-Treatment Project (PTP) encompasses the direct plasma treatment of all types of waste (from source and landfill), as well as an environmental vision and economic evaluation of the use of the gas produced for fuel and electricity production in KSA, especially in the pilgrimage season in the holy city Makkah. The electrical power required for the plasma-treatment process is estimated at 5000 kW (2000 kW used for the operation of the system and 3000 kW sold), taking into account the fact that: (1) the processing capacity of solid waste is 100 tons per day (2) and the sale of electricity amounts to 23.8 MW at 0.18 EUR per kWh. (3) The profit from the sale of electricity per year is estimated at 3.27 million EUR and the estimated profit of solid-waste treatment amounts to 6 million EUR per year and (4) the gross profit per ton of solid waste totals 8 million EUR per year. The present article introduces the first stage of the PTP, in Makkah in the pilgrimage season, which consists of five stages: (1) study and treatment of waste streams, (2) slaughterhouse waste treatment, (3) treatment of refuse-derived fuel, (4) treatment of car tires and (5) treatment of slag (the fifth stage associated with each stage from the four previous stages).

Direct Simulation Monte Carlo Simulations of Low Pressure Semiconductor Plasma Processing

DOE Office of Scientific and Technical Information (OSTI.GOV)

Gochberg, L. A.; Ozawa, T.; Deng, H.

2008-12-31

The two widely used plasma deposition tools for semiconductor processing are Ionized Metal Physical Vapor Deposition (IMPVD) of metals using either planar or hollow cathode magnetrons (HCM), and inductively-coupled plasma (ICP) deposition of dielectrics in High Density Plasma Chemical Vapor Deposition (HDP-CVD) reactors. In these systems, the injected neutral gas flows are generally in the transonic to supersonic flow regime. The Hybrid Plasma Equipment Model (HPEM) has been developed and is strategically and beneficially applied to the design of these tools and their processes. For the most part, the model uses continuum-based techniques, and thus, as pressures decrease below 10more » mTorr, the continuum approaches in the model become questionable. Modifications have been previously made to the HPEM to significantly improve its accuracy in this pressure regime. In particular, the Ion Monte Carlo Simulation (IMCS) was added, wherein a Monte Carlo simulation is used to obtain ion and neutral velocity distributions in much the same way as in direct simulation Monte Carlo (DSMC). As a further refinement, this work presents the first steps towards the adaptation of full DSMC calculations to replace part of the flow module within the HPEM. Six species (Ar, Cu, Ar*, Cu*, Ar{sup +}, and Cu{sup +}) are modeled in DSMC. To couple SMILE as a module to the HPEM, source functions for species, momentum and energy from plasma sources will be provided by the HPEM. The DSMC module will then compute a quasi-converged flow field that will provide neutral and ion species densities, momenta and temperatures. In this work, the HPEM results for a hollow cathode magnetron (HCM) IMPVD process using the Boltzmann distribution are compared with DSMC results using portions of those HPEM computations as an initial condition.« less

Surface modification of gutta-percha cones by non-thermal plasma.

PubMed

Prado, Maíra; Menezes, Marilia Santana de Oliveira; Gomes, Brenda Paula Figueiredo de Almeida; Barbosa, Carlos Augusto de Melo; Athias, Leonardo; Simão, Renata Antoun

2016-11-01

This study was designed to evaluate the effects of Oxygen and Argon plasma on gutta-percha surfaces. A total of 185 flat smooth gutta-percha surfaces were used. Samples were divided into groups: control: no plasma treatment; Oxygen: treatment with Oxygen plasma for 1min; Argon: treatment with Argon plasma for 1min. Samples were evaluated topographically by scanning electron microscopy and atomic force microscopy; and chemically by Fourier Transform-infrared Spectroscopy. A goniometer was used to determine the surface free energy and the wettability of the endodontic sealers. Additionally 60 bovine teeth were filled using pellets of gutta-percha (control, oxygen and argon plasma) and the sealers. Teeth were evaluated by push-out and microleakage tests. Data were statistically analyzed using specific tests. Argon plasma did not change the surface topography, while Oxygen plasma led to changes. Both treatments chemically modified the gutta-percha surface. Argon and Oxygen plasma increased the surface free energy and favored the wettability of AH Plus and Pulp Canal Sealer EWT. Regarding bond strength analysis, for AH Plus sealer, both plasma treatments on gutta-percha favored the bond strength to dentin. However, for Pulp Canal Sealer, there is no statistically significant influence. For leakage test, dye penetration occurred between sealer and dentin in all groups. In conclusion, Oxygen plasma led to both topographic and chemical changes in the gutta-percha surface, while Argon plasma caused only chemical changes. Both treatments increased the surface free energy, favoring the wettability of AH Plus and Pulp Canal Sealer EWT sealers and influenced positively in the adhesion and leakage. Copyright © 2016 Elsevier B.V. All rights reserved.

Plasma enhanced chemical vapor deposition of wear resistant gradual a-Si1-x:Cx:H coatings on nickel-titanium for biomedical applications

NASA Astrophysics Data System (ADS)

Niermann, Benedikt; Böke, Marc; Schauer, Janine-Christina; Winter, Jörg

2010-03-01

Plasma enhanced chemical vapor deposition has been used to deposit thin films with gradual transitions from silicon to carbon on Cu, Ni, stainless steel, and NiTi. Thus show low stress, elasticity, and wear resistance with excellent adhesion on all metals under investigation. Already at low Si concentrations of 10 at. % the intrinsic stress is considerably reduced compared to pure diamondlike carbon (DLC) films. The deposition process is controlled by optical emission spectroscopy. This technique has been applied to monitor the growth precursors and to correlate them with the film composition. The compositions of the films were determined by Rutherford backscattering spectroscopy and XPS measurements. Due to the elastic properties of the gradual transition and the excellent biocompatibility of DLC, the described film systems present a useful coating for biomedical applications.

Alignment mechanism of carbon nanofibers produced by plasma-enhanced chemical-vapor deposition

NASA Astrophysics Data System (ADS)

Merkulov, Vladimir I.; Melechko, Anatoli V.; Guillorn, Michael A.; Lowndes, Douglas H.; Simpson, Michael L.

2001-10-01

We report experimental evidence showing a direct correlation between the alignment of carbon nanofibers (CNFs) prepared by plasma-enhanced chemical-vapor deposition and the location of the catalyst particle during CNF growth. In particular, we find that CNFs that have a catalyst particle at the tip (i.e., growth proceeds from the tip) align along the electric-field lines, whereas CNFs with the particle at the base (i.e., growth proceeds from the base) grow in random orientations. We propose a model that explains the alignment process as a result of a feedback mechanism associated with a nonuniform stress (part tensile, part compressive) that is created across the interface of the catalyst particle with the CNF due to electrostatic forces. Furthermore, we propose that the alignment seen recently in some dense CNF films is due to a crowding effect and is not directly the result of electrostatic forces.

Cold crucible induction melter test for crystalline ceramic waste form fabrication: A feasibility assessment

DOE PAGES

Amoroso, Jake W.; Marra, James; Dandeneau, Christopher S.; ...

2017-01-18

The first scaled proof-of-principle cold crucible induction melter (CCIM) test to process a multiphase ceramic waste form from a simulated combined (Cs/Sr, lanthanide and transition metal fission products) commercial used nuclear fuel waste stream was recently conducted in the United States. X-ray diffraction, 2-D X-ray absorption near edge structure (XANES), electron microscopy, inductively coupled plasma-atomic emission spectroscopy (and inductively coupled plasma-mass spectroscopy for Cs), and product consistency tests were used to characterize the fabricated CCIM material. Characterization analyses confirmed that a crystalline ceramic with a desirable phase assemblage was produced from a melt using a CCIM. We identified primary hollandite,more » pyrochlore/zirconolite, and perovskite phases in addition to minor phases rich in Fe, Al, or Cs. The material produced in the CCIM was chemically homogeneous and displayed a uniform phase assemblage with acceptable aqueous chemical durability.« less

Low Temperature Metal Free Growth of Graphene on Insulating Substrates by Plasma Assisted Chemical Vapor Deposition

PubMed Central

Muñoz, R.; Munuera, C.; Martínez, J. I.; Azpeitia, J.; Gómez-Aleixandre, C.; García-Hernández, M.

2016-01-01

Direct growth of graphene films on dielectric substrates (quartz and silica) is reported, by means of remote electron cyclotron resonance plasma assisted chemical vapor deposition r-(ECR-CVD) at low temperature (650°C). Using a two step deposition process- nucleation and growth- by changing the partial pressure of the gas precursors at constant temperature, mostly monolayer continuous films, with grain sizes up to 500 nm are grown, exhibiting transmittance larger than 92% and sheet resistance as low as 900 Ω·sq-1. The grain size and nucleation density of the resulting graphene sheets can be controlled varying the deposition time and pressure. In additon, first-principles DFT-based calculations have been carried out in order to rationalize the oxygen reduction in the quartz surface experimentally observed. This method is easily scalable and avoids damaging and expensive transfer steps of graphene films, improving compatibility with current fabrication technologies. PMID:28070341

Room temperature chemical vapor deposition of c-axis ZnO

NASA Astrophysics Data System (ADS)

Barnes, Teresa M.; Leaf, Jacquelyn; Fry, Cassandra; Wolden, Colin A.

2005-02-01

Highly (0 0 2) oriented ZnO films have been deposited at temperatures between 25 and 230 °C by high-vacuum plasma-assisted chemical vapor deposition (HVP-CVD) on glass and silicon substrates. The HVP-CVD process was found to be weakly activated with an apparent activation energy of ∼0.1 eV, allowing room temperature synthesis. Films deposited on both substrates displayed a preferential c-axis texture over the entire temperature range. Films grown on glass demonstrated high optical transparency throughout the visible and near infrared.

Inactivation of Escherichia coli on blueberries using cold plasma with chemical augmentation inside a partial vacuum

USDA-ARS?s Scientific Manuscript database

Justification: The mechanism by which cold plasma inactivates pathogens is through the production of free reactive chemical species. Unfortunately, the most reactive chemical species have the shortest half-life. In a vacuum their half-life is believed to be prolonged. Additionally, these reactive sp...

A phonon thermodynamics approach of gold nanofluids synthesized in solution plasma

DOE Office of Scientific and Technical Information (OSTI.GOV)

Heo, YongKang, E-mail: yk@rd.numse.nagoya-u.ac.jp; Aburaya, Daiki, E-mail: daiki@rd.numse.nagoya-u.ac.jp; Antoaneta Bratescu, Maria, E-mail: maria@rd.numse.nagoya-u.ac.jp

2014-03-17

The phonon thermodynamics theory for liquids was applied to explain the thermal characteristics of gold nanofluids synthesized by a simple, one-step, and chemical-free method using an electrical discharge in a liquid environment termed solution plasma process. The specific heat capacity of nanofluids was measured with a differential scanning calorimeter using the ratio between the differential heat flow rate and the heating rate. The decrease of the specific heat capacity with 10% of gold nanofluids relative to water was explained by the decrease of Frenkel relaxation time with 22%, considering a solid-like state model of liquids.

Size- and orientation-selective si nanowire growth: thermokinetic effects of nanoscale plasma chemistry.

PubMed

Mehdipour, Hamid; Ostrikov, Kostya Ken

2013-02-06

A multiscale, multiphase thermokinetic model is used to show the effective control of the growth orientation of thin Si NWs for nanoelectronic devices enabled by nanoscale plasma chemistry. It is shown that very thin Si NWs with [110] growth direction can nucleate at much lower process temperatures and pressures compared to thermal chemical vapor deposition where [111]-directed Si NWs are predominantly grown. These findings explain a host of experimental results and offer the possibility of energy- and matter-efficient, size- and orientation-controlled growth of [110] Si NWs for next-generation nanodevices.

Chemical fingerprint and metabolic profile analysis of Citrus reticulate 'Chachi' decoction by HPLC-PDA-IT-MS(n) and HPLC-Quadrupole-Orbitrap-MS method.

PubMed

Ye, Xiaolan; Cao, Di; Zhao, Xin; Song, Fenyun; Huang, Qinghua; Fan, Guorong; Wu, Fuhai

2014-11-01

A method incorporating HPLC-PDA-IT-MS(n) with HPLC-Quadrupole-Orbitrap-MS was developed for the investigation of chemical fingerprint of Citrus reticulate 'Chachi' decoction (CRCD) and metabolic profile of SD rat plasma sample after oral administration of CRCD (1.5 g herb/kg). A total of 27 chemical constituents of CRCD were identified from their MW, UV spectra, MS(n) data and retention behavior by comparing the results with those of the reference standards or literature. And 43 compounds were detected in dosed SD rat plasma samples, including 9 prototypes which were identified as hesperetin, isosinensetin, sinensetin, tetramethyl-O-isoscutellarein, nobiletin, tetramethyl-O-scutellarein, HMF (3,5,6,7,8,3',4'-heptamethoxyflavone), tangeretin and 5-demethylnobiletin and 34 metabolites underwent metabolic process of demethylation, glucuronide conjugation, sulfate conjugation or mixed modes. This is the first research for the metabolic profile of CRCD in SD rats, which could lay a foundation for the further studies of CRC or its formulation. Copyright © 2014 Elsevier B.V. All rights reserved.

Acrylic acid plasma polymerization for biomedical use

NASA Astrophysics Data System (ADS)

Bitar, Rim; Cools, Pieter; De Geyter, Nathalie; Morent, Rino

2018-08-01

Since a few decades, polymeric materials have played a central role in regenerative medicine and tissue engineering as artificial tissue replacements and organ transplantation devices. Chemical and topographical surface modifications of biomaterials are often required to achieve an overall better biocompatibility. Non-thermal plasma is a non-invasive, solvent-free alternative for modifying polymeric surface properties without affecting the bulk of the material. Plasma polymerization of organic compounds has proven to be an effective tool for thin film production with specific surface chemistries, useful for biomedical applications. These polymer layers have received a growing interest in tissue regeneration and biomolecules immobilization processes. Many different types of chemical functional groups can be introduced, but the focus of this review will be on carboxylic acid groups. Thin films consisting of carboxylic acid functional groups are considered attractive for biomedical applications since these are known for stimulating the adhesion and proliferation of fibroblasts and other kind of cells. Therefore, an overview on the use of acrylic acid (AAc) as a precursor or for the plasma-assisted deposition of carboxylic-group containing-films in bio-interface research activities, will be described in this review. The review will specifically focus on plasma polymerized acrylic acid (PPAA) coatings that are obtained using a variety of plasma deposition techniques. Moreover, the influence of plasma parameters on surface properties such as wettability, surface topography and chemical composition will be discussed in detail. The correlation between different parameters will be studied and a general recipe leading to the successful deposition of COOH-rich stable coatings will be extracted and linked to their ability to improve cell growth, proliferation and differentiation, all leading to the further progress in the biomedical field. A lot of publications claim to have developed suitable coatings for biomedical applications, but neglect the importance of coating stability. For those publications exhibiting sufficient coating stability, a lot of initial in vitro experiments were performed, but the number in-depth studies on the mechanisms behind the cell-material interactions is limited. Although AAc forms an excellent precursor for biomedical coatings, its potential still needs to be explored in more details.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Anand, Venu, E-mail: venuanand@cense.iisc.ernet.in, E-mail: venuanand83@gmail.com; Shivashankar, S. A.; Nair, Aswathi R.

Gas discharge plasmas used for thinfilm deposition by plasma-enhanced chemical vapor deposition (PECVD) must be devoid of contaminants, like dust or active species which disturb the intended chemical reaction. In atmospheric pressure plasma systems employing an inert gas, the main source of such contamination is the residual air inside the system. To enable the construction of an atmospheric pressure plasma (APP) system with minimal contamination, we have carried out fluid dynamic simulation of the APP chamber into which an inert gas is injected at different mass flow rates. On the basis of the simulation results, we have designed and builtmore » a simple, scaled APP system, which is capable of holding a 100 mm substrate wafer, so that the presence of air (contamination) in the APP chamber is minimized with as low a flow rate of argon as possible. This is examined systematically by examining optical emission from the plasma as a function of inert gas flow rate. It is found that optical emission from the plasma shows the presence of atmospheric air, if the inlet argon flow rate is lowered below 300 sccm. That there is minimal contamination of the APP reactor built here, was verified by conducting an atmospheric pressure PECVD process under acetylene flow, combined with argon flow at 100 sccm and 500 sccm. The deposition of a polymer coating is confirmed by infrared spectroscopy. X-ray photoelectron spectroscopy shows that the polymer coating contains only 5% of oxygen, which is comparable to the oxygen content in polymer deposits obtained in low-pressure PECVD systems.« less

Selective dry etching of silicon containing anti-reflective coating

NASA Astrophysics Data System (ADS)

Sridhar, Shyam; Nolan, Andrew; Wang, Li; Karakas, Erdinc; Voronin, Sergey; Biolsi, Peter; Ranjan, Alok

2018-03-01

Multi-layer patterning schemes involve the use of Silicon containing Anti-Reflective Coating (SiARC) films for their anti-reflective properties. Patterning transfer completion requires complete and selective removal of SiARC which is very difficult due to its high silicon content (>40%). Typically, SiARC removal is accomplished through a non-selective etch during the pattern transfer process using fluorine containing plasmas, or an ex-situ wet etch process using hydrofluoric acid is employed to remove the residual SiARC, post pattern transfer. Using a non-selective etch may result in profile distortion or wiggling, due to distortion of the underlying organic layer. The drawbacks of using wet etch process for SiARC removal are increased overall processing time and the need for additional equipment. Many applications may involve patterning of active structures in a poly-Si layer with an underlying oxide stopping layer. In such applications, SiARC removal selective to oxide using a wet process may prove futile. Removing SiARC selectively to SiO2 using a dry etch process is also challenging, due to similarity in the nature of chemical bonds (Si - O) in the two materials. In this work, we present highly selective etching of SiARC, in a plasma driven by a surface wave radial line slot antenna. The first step in the process involves an in-situ modification of the SiARC layer in O2 plasma followed by selective etching in a NF3/H2 plasma. Surface treatment in O2 plasma resulted in enhanced etching of the SiARC layer. For the right processing conditions, in-situ NF3/H2 dry etch process demonstrated selectivity values greater than 15:1 with respect to SiO2. The etching chemistry, however, was sensitive to NF3:H2 gas ratio. For dilute NF3 in H2, no SiARC etching was observed. Presumably, this is due to the deposition of ammonium fluorosilicate layer that occurs for dilute NF3/H2 plasmas. Additionally, challenges involved in selective SiARC removal (selective to SiO2, organic and Si layers) post pattern transfer, in a multi-layer structure will be discussed.

Metal-boride phase formation on tungsten carbide (WC-Co) during microwave plasma chemical vapor deposition

NASA Astrophysics Data System (ADS)

Johnston, Jamin M.; Catledge, Shane A.

2016-02-01

Strengthening of cemented tungsten carbide by boriding is used to improve the wear resistance and lifetime of carbide tools; however, many conventional boriding techniques render the bulk carbide too brittle for extreme conditions, such as hard rock drilling. This research explored the variation in metal-boride phase formation during the microwave plasma enhanced chemical vapor deposition process at surface temperatures from 700 to 1100 °C. We showed several well-adhered metal-boride surface layers consisting of WCoB, CoB and/or W2CoB2 with average hardness from 23 to 27 GPa and average elastic modulus of 600-730 GPa. The metal-boride interlayer was shown to be an effective diffusion barrier against elemental cobalt; migration of elemental cobalt to the surface of the interlayer was significantly reduced. A combination of glancing angle X-ray diffraction, electron dispersive spectroscopy, nanoindentation and scratch testing was used to evaluate the surface composition and material properties. An evaluation of the material properties shows that plasma enhanced chemical vapor deposited borides formed at substrate temperatures of 800 °C, 850 °C, 900 °C and 1000 °C strengthen the material by increasing the hardness and elastic modulus of cemented tungsten carbide. Additionally, these boride surface layers may offer potential for adhesion of ultra-hard carbon coatings.

Formation of Cosmic Carbon Dust Analogues in Plasma Reactors

NASA Technical Reports Server (NTRS)

Salama, Farid

2016-01-01

Cosmic carbon dust analogs are produced, processed and analyzed in the laboratory using NASA's COSmIC (COSmIC Simulation Chamber) Facility. These experiments can be used to derive information on the most efficient molecular precursors in the chemical pathways that eventually lead to the formation of carbonaceous grains in the stellar envelopes of carbon stars.

Plasma characterization for application in ballistics

DOE Office of Scientific and Technical Information (OSTI.GOV)

Katulka, G.; Nusca, M.; White, K.

1996-12-31

There is currently a strong motivation for improving the existing performance of fielded military gun systems. For that objective, research over the past several years has been carried out in an effort to enhance performance by addition of energy into the gun chamber by way of a plasma generator. This energy addition, referred to as Electro-thermal Chemical (ETC) propulsion, can be readily controlled electrically where it can be used to ignite the chamber`s energetic material, enhance the total energy, and control the interior process through control of the propellant combustion. To realize the potential advantages of this system it ismore » important to characterize the plasma generator in terms of (a) the impedance characteristics and its relationship to the pulse forming network used to generate the plasma, (b) the plasma output energy components such as radiation and convection in both time and space, (c) the details of the hydrodynamic interactions of the plasma with the propelling charge bed in the gun chamber and, (d) the direct effect of the plasma on the propellant reactions. Experimental studies have been carried out to study the effect of the plasma radiation on the propellant characteristics related to combustion.« less

Generator of chemically active low-temperature plasma

NASA Astrophysics Data System (ADS)

Tyuftyaev, A. S.; Gadzhiev, M. Kh; Sargsyan, M. A.; Demirov, N. A.; Spector, N. O.

2016-11-01

A new generator of high enthalpy (H 0 > 40 kJ/g), chemically active nitrogen and air plasmas was designed and constructed. Main feature of the generator is an expanding channel of an output electrode; the generator belongs to the class of DC plasma torches with thermionic cathode with an efficiency of 80%. The generator ensures the formation of a slightly divergent plasma jet (2α = 12°) with a diameter of D = 10-12 mm, an electric arc maximum power of 20-50 kW, plasma forming gas flow rate 1.0-2.0 g/s, and the average plasma temperature at an outlet of 8000-11000 K.

Low-temperature plasma-deposited silicon epitaxial films: Growth and properties

DOE Office of Scientific and Technical Information (OSTI.GOV)

Demaurex, Bénédicte, E-mail: benedicte.demaurex@epfl.ch; Bartlome, Richard; Seif, Johannes P.

2014-08-07

Low-temperature (≤200 °C) epitaxial growth yields precise thickness, doping, and thermal-budget control, which enables advanced-design semiconductor devices. In this paper, we use plasma-enhanced chemical vapor deposition to grow homo-epitaxial layers and study the different growth modes on crystalline silicon substrates. In particular, we determine the conditions leading to epitaxial growth in light of a model that depends only on the silane concentration in the plasma and the mean free path length of surface adatoms. For such growth, we show that the presence of a persistent defective interface layer between the crystalline silicon substrate and the epitaxial layer stems not only frommore » the growth conditions but also from unintentional contamination of the reactor. Based on our findings, we determine the plasma conditions to grow high-quality bulk epitaxial films and propose a two-step growth process to obtain device-grade material.« less

Improvement of the adsorption of quaternary ammonium on polypropylene affinity membrane through the control of its surface properties.

PubMed

Hachache, Naima; Bal, Youcef; Debarnot, Dominique; Poncin-Epaillard, Fabienne

2014-02-01

Polypropylene fiber meshes were plasma-treated in order to attach new chemical functions corresponding to acidic or basic groups without altering the roughness of such thin material. An almost complete wettability of these plasma-treated materials is obtained. Because of the plasma-grafting of acid or amino moieties, such surface treatment allows increasing the adsorption rate of quaternary ammonium molecule like Aliquat 336. This increase was explained by specific interactions of ammonium head of the Aliquat 336 and hydrophilic group of plasma-treated PP, followed by the adsorption of a further layer of Aliquat 336 through hydrophobic interactions of its hydrocarbon chain. These interactions between the carrier and the polymeric surface were characterized leading to physisorption mechanism. Such new material could be applied to the extraction process since no evidence of aging was given. Copyright © 2013 Elsevier B.V. All rights reserved.

Non-equilibrium Microwave Plasma for Efficient High Temperature Chemistry.

PubMed

van den Bekerom, Dirk; den Harder, Niek; Minea, Teofil; Gatti, Nicola; Linares, Jose Palomares; Bongers, Waldo; van de Sanden, Richard; van Rooij, Gerard

2017-08-01

A flowing microwave plasma based methodology for converting electric energy into internal and/or translational modes of stable molecules with the purpose of efficiently driving non-equilibrium chemistry is discussed. The advantage of a flowing plasma reactor is that continuous chemical processes can be driven with the flexibility of startup times in the seconds timescale. The plasma approach is generically suitable for conversion/activation of stable molecules such as CO2, N2 and CH4. Here the reduction of CO2 to CO is used as a model system: the complementary diagnostics illustrate how a baseline thermodynamic equilibrium conversion can be exceeded by the intrinsic non-equilibrium from high vibrational excitation. Laser (Rayleigh) scattering is used to measure the reactor temperature and Fourier Transform Infrared Spectroscopy (FTIR) to characterize in situ internal (vibrational) excitation as well as the effluent composition to monitor conversion and selectivity.

Low-temperature plasma-deposited silicon epitaxial films: Growth and properties

DOE PAGES

Demaurex, Bénédicte; Bartlome, Richard; Seif, Johannes P.; ...

2014-08-05

Low-temperature (≤ 180 °C) epitaxial growth yields precise thickness, doping, and thermal-budget control, which enables advanced-design semiconductor devices. In this paper, we use plasma-ehanced chemical vapor deposition to grow homo-epitaxial layers and study the different growth modes on crystalline silicon substrates. In particular, we determine the conditions leading to epitaxial growth in light of a model that depends only on the silane concentration in the plasma and the mean free path length of surface adatoms. For such growth, we show that the presence of a persistent defective interface layer between the crystalline silicon substrate and the epitaxial layer stems notmore » only from the growth conditions but also from unintentional contamination of the reactor. As a result of our findings, we determine the plasma conditions to grow high-quality bulk epitaxial films and propose a two-step growth process to obtain device-grade material.« less

Bio-Decontamination of Water and Surfaces by DC Discharges in Atmospheric Air

NASA Astrophysics Data System (ADS)

Machala, Zdenko; Tarabová, Barbora; Pelach, Michal; Šipoldová, Zuzana; Hensel, Karol; Janda, Mário; Šikurová, Libuša

Two types of DC-driven atmospheric air discharges, including a streamer corona and a transient spark with short high current pulses of limited energy, were employed for bio-decontamination of water and various surfaces (agar plates, plastic foils, human teeth) contaminated by bacteria or spores (Salmonella typhimurium, Bacillus cereus). Both discharges generate cold non-equilibrium plasma. The discharges combined with the electro-spraying of the treated water through the needle electrode lead to fast and efficient bio-decontamination. Experiments comparing direct and indirect plasma effects, oxidation stress measurements in the cell membranes, and chemical changes induced in the treated water enable assessment of the plasma agents being responsible for microbial inactivation. Radicals and reactive oxygen species seem to be dominant biocidal agents, although deeper understanding of the plasma-induced water chemistry and of the temporal evolution of the bio-inactivation processes is needed.

A comparative study of carbon plasma emission in methane and argon atmospheres

NASA Astrophysics Data System (ADS)

Yousfi, H.; Abdelli-Messaci, S.; Ouamerali, O.; Dekhira, A.

2018-04-01

The interaction between laser produced plasma (LPP) and an ambient gas is largely investigated by Optical Emission Spectroscopy (OES). The analysis of carbon plasma produced by an excimer KrF laser was performed under controlled atmospheres of methane and argon. For each ambient gas, the features of produced species have been highlighted. Using the time of flight (TOF) analysis, we have observed that the C and C2 exhibit a triple and a double peaks respectively in argon atmosphere in contrast to the methane atmosphere. The evolution of the first peaks of C and C2 follows the plasma expansion, whereas the second peaks move backward, undergoing reflected shocks. It was found that the translational temperature, obtained by Shifted Maxwell Boltzmann distribution function is strongly affected by the nature of ambient gas. The dissociation of CH4 by electronic impact presents the principal approach for explaining the emission of CH radical in reactive plasma. Some chemical reactions have been proposed in order to explain the formation process of molecular species.

Plasma fluorination of vertically aligned carbon nanotubes: functionalization and thermal stability.

PubMed

Struzzi, Claudia; Scardamaglia, Mattia; Hemberg, Axel; Petaccia, Luca; Colomer, Jean-François; Snyders, Rony; Bittencourt, Carla

2015-01-01

Grafting of fluorine species on carbon nanostructures has attracted interest due to the effective modification of physical and chemical properties of the starting materials. Various techniques have been employed to achieve a controlled fluorination yield; however, the effect of contaminants is rarely discussed, although they are often present. In the present work, the fluorination of vertically aligned multiwalled carbon nanotubes was performed using plasma treatment in a magnetron sputtering chamber with fluorine diluted in an argon atmosphere with an Ar/F2 ratio of 95:5. The effect of heavily diluted fluorine in the precursor gas mixture is investigated by evaluating the modifications in the nanotube structure and the electronic properties upon plasma treatment. The existence of oxygen-based grafted species is associated with background oxygen species present in the plasma chamber in addition to fluorine. The thermal stability and desorption process of the fluorine species grafted on the carbon nanotubes during the fluorine plasma treatment were evaluated by combining different spectroscopic techniques.

On the structure of pulsed plasma jets

NASA Astrophysics Data System (ADS)

Cavolowsky, John Arthur

A pulsed plasma jet is a turbulent, inhomogeneous fluid mechanical discharge capable of initiating and inhancing combustion. Having shown the ability to ignite lean fuel mixtures, is now offers the potential for real-time control of combustion processes. The fluid mechanical and chemical properties of such jets are explored. The fluid mechanical structure of the jet was examined using two optical diagnostic techniques. Self-light streak photography provided information on the motion of luminous gas particles in its core. The turbulent, thermal evolution of the jet was explored using high speed laser schlieren cinematography. By examine plasma jet generators with both opaque and transparent plasma cavities, detailed information on plasma formation and jet structure, beginning with the electric arc discharge in the cavity, was obtained. Molecular beam mass spectroscopy was used to determine temperature and species concentration in the jet. Both noncombustible and combustible jets were studied. Species measurements in combustible jets revealed significant concentrations of radicals and products of complete as well as incomplete combustion.

Apparatus for chemical synthesis

DOEpatents

Kong, Peter C [Idaho Falls, ID; Herring, J Stephen [Idaho Falls, ID; Grandy, Jon D [Idaho Falls, ID

2011-05-10

A method and apparatus for forming a chemical hydride is described and which includes a pseudo-plasma-electrolysis reactor which is operable to receive a solution capable of forming a chemical hydride and which further includes a cathode and a movable anode, and wherein the anode is moved into and out of fluidic, ohmic electrical contact with the solution capable of forming a chemical hydride and which further, when energized produces an oxygen plasma which facilitates the formation of a chemical hydride in the solution.

Method and apparatus for chemical synthesis

DOEpatents

Kong; Peter C. , Herring; J. Stephen , Grandy; Jon D.

2007-12-04

A method and apparatus for forming a chemical hydride is described and which includes a pseudo-plasma-electrolysis reactor which is operable to receive a solution capable of forming a chemical hydride and which further includes a cathode and a movable anode, and wherein the anode is moved into and out of fluidic, ohmic electrical contact with the solution capable of forming a chemical hydride and which further, when energized produces an oxygen plasma which facilitates the formation of a chemical hydride in the solution.

Experimental benchmark of kinetic simulations of capacitively coupled plasmas in molecular gases

NASA Astrophysics Data System (ADS)

Donkó, Z.; Derzsi, A.; Korolov, I.; Hartmann, P.; Brandt, S.; Schulze, J.; Berger, B.; Koepke, M.; Bruneau, B.; Johnson, E.; Lafleur, T.; Booth, J.-P.; Gibson, A. R.; O'Connell, D.; Gans, T.

2018-01-01

We discuss the origin of uncertainties in the results of numerical simulations of low-temperature plasma sources, focusing on capacitively coupled plasmas. These sources can be operated in various gases/gas mixtures, over a wide domain of excitation frequency, voltage, and gas pressure. At low pressures, the non-equilibrium character of the charged particle transport prevails and particle-based simulations become the primary tools for their numerical description. The particle-in-cell method, complemented with Monte Carlo type description of collision processes, is a well-established approach for this purpose. Codes based on this technique have been developed by several authors/groups, and have been benchmarked with each other in some cases. Such benchmarking demonstrates the correctness of the codes, but the underlying physical model remains unvalidated. This is a key point, as this model should ideally account for all important plasma chemical reactions as well as for the plasma-surface interaction via including specific surface reaction coefficients (electron yields, sticking coefficients, etc). In order to test the models rigorously, comparison with experimental ‘benchmark data’ is necessary. Examples will be given regarding the studies of electron power absorption modes in O2, and CF4-Ar discharges, as well as on the effect of modifications of the parameters of certain elementary processes on the computed discharge characteristics in O2 capacitively coupled plasmas.

Morphological Transition in Diamond Thin-Films Induced by Boron in a Microwave Plasma Deposition Process.

PubMed

Baker, Paul A; Goodloe, David R; Vohra, Yogesh K

2017-11-14

The purpose of this study is to understand the basic mechanisms responsible for the synthesis of nanostructured diamond films in a microwave plasma chemical vapor deposition (MPCVD) process and to identify plasma chemistry suitable for controlling the morphology and electrical properties of deposited films. The nanostructured diamond films were synthesized by MPCVD on Ti-6Al-4V alloy substrates using H₂/CH₄/N₂ precursor gases and the plasma chemistry was monitored by the optical emission spectroscopy (OES). The synthesized thin-films were characterized by x -ray diffraction and scanning electron microscopy. The addition of B₂H₆ to the feedgas during MPCVD of diamond thin-films changes the crystal grain size from nanometer to micron scale. Nanostructured diamond films grown with H₂/CH₄/N₂ gases demonstrate a broad (111) Bragg x -ray diffraction peak (Full-Width at Half-Maximum (FWHM) = 0.93° 2θ), indicating a small grain size, whereas scans show a definite sharpening of the diamond (111) peak (FWHM = 0.30° 2θ) with the addition of boron. OES showed a decrease in CN (carbon-nitrogen) radical in the plasma with B₂H₆ addition to the gas mixture. Our study indicates that CN radical plays a critical role in the synthesis of nanostructured diamond films and suppression of CN radical by boron-addition in the plasma causes a morphological transition to microcrystalline diamond.

Form control in atmospheric pressure plasma processing of ground fused silica

NASA Astrophysics Data System (ADS)

Li, Duo; Wang, Bo; Xin, Qiang; Jin, Huiliang; Wang, Jun; Dong, Wenxia

2014-08-01

Atmospheric Pressure Plasma Processing (APPP) using inductively coupled plasma has demonstrated that it can achieve comparable removal rate on the optical surface of fused silica under the atmosphere pressure and has the advantage of inducing no sub-surface damage for its non-contact and chemical etching mechanism. APPP technology is a cost effective way, compared with traditional mechanical polishing, magnetorheological finishing and ion beam figuring. Thus, due to these advantages, this technology is being tested to fabricate large aperture optics of fused silica to help shorten the polishing time in optics fabrication chain. Now our group proposes to use inductively coupled plasma processing technology to fabricate ground surface of fused silica directly after the grinding stage. In this paper, form control method and several processing parameters are investigated to evaluate the removal efficiency and the surface quality, including the robustness of removal function, velocity control mode and tool path strategy. However, because of the high heat flux of inductively coupled plasma, the removal depth with time can be non-linear and the ground surface evolvement will be affected. The heat polishing phenomenon is founded. The value of surface roughness is reduced greatly, which is very helpful to reduce the time of follow-up mechanical polishing. Finally, conformal and deterministic polishing experiments are analyzed and discussed. The form error is less 3%, before and after the APPP, when 10μm depth of uniform removal is achieved on a 60×60mm ground fused silica. Also, a basin feature is fabricated to demonstrate the figuring capability and stability. Thus, APPP is a promising technology in processing the large aperture optics.

Plasma and catalyst for the oxidation of NOx

NASA Astrophysics Data System (ADS)

Jõgi, Indrek; Erme, Kalev; Levoll, Erik; Raud, Jüri; Stamate, Eugen

2018-03-01

Efficient exhaust gas cleaning from NO x (NO and NO2) by absorption and adsorption based methods requires the oxidation of NO. The application of non-thermal plasma is considered as a promising oxidation method but the oxidation of NO by direct plasma remains limited due to the back-reaction of NO2 to NO mediated by O radicals in plasma. Indirect NO oxidation by plasma produced ozone allows to circumvent the back-reaction and further oxidize NO2 to N2O5 but the slow reaction rate for the latter process limits the efficiency of this process. Present paper gives an overview of the role of metal-oxide catalysts in the improvement of oxidation efficiency for both direct and indirect plasma oxidation of NO x . The plasma produced active oxygen species (O, O3) were shown to play an important role in the reactions taking place on the catalyst surfaces while the exact mechanism and extent of the effect were different for direct and indirect oxidation. In the case of direct plasma oxidation, both short and long lifetime oxygen species could reach the catalyst and participate in the oxidation of NO to NO2. The back-reaction in the plasma phase remained still important factor and limited the effect of catalyst. In the case of indirect oxidation, only ozone could reach the catalyst surface and improve the oxidation of NO2 to N2O5. The effect of catalyst at different experimental conditions was quantitatively described with the aid of simple global chemical kinetic models derived for the NO x oxidation either by plasma or ozone. The models allowed to compare the effect of different catalysts and to analyze the limitations for the efficiency improvement by catalyst.

Optical sensor for real-time weld defect detection

NASA Astrophysics Data System (ADS)

Ancona, Antonio; Maggipinto, Tommaso; Spagnolo, Vincenzo; Ferrara, Michele; Lugara, Pietro M.

2002-04-01

In this work we present an innovative optical sensor for on- line and non-intrusive welding process monitoring. It is based on the spectroscopic analysis of the optical VIS emission of the welding plasma plume generated in the laser- metal interaction zone. Plasma electron temperature has been measured for different chemical species composing the plume. Temperature signal evolution has been recorded and analyzed during several CO2-laser welding processes, under variable operating conditions. We have developed a suitable software able to real time detect a wide range of weld defects like crater formation, lack of fusion, excessive penetration, seam oxidation. The same spectroscopic approach has been applied for electric arc welding process monitoring. We assembled our optical sensor in a torch for manual Gas Tungsten Arc Welding procedures and tested the prototype in a manufacturing industry production line. Even in this case we found a clear correlation between the signal behavior and the welded joint quality.

The automated array assembly task of the low-cost silicon solar array project, phase 2

NASA Technical Reports Server (NTRS)

Coleman, M. G.; Pryor, R. A.; Sparks, T. G.; Legge, R.; Saltzman, D. L.

1980-01-01

Several specific processing steps as part of a total process sequence for manufacturing silicon solar cells were studied. Ion implantation was identified as the preferred process step for impurity doping. Unanalyzed beam ion implantation was shown to have major cost advantages over analyzed beam implantation. Further, high quality cells were fabricated using a high current unanalyzed beam. Mechanically masked plasma patterning of silicon nitride was shown to be capable of forming fine lines on silicon surfaces with spacings between mask and substrate as great as 250 micrometers. Extensive work was performed on advances in plated metallization. The need for the thick electroless palladium layer was eliminated. Further, copper was successfully utilized as a conductor layer utilizing nickel as a barrier to copper diffusion into the silicon. Plasma etching of silicon for texturing and saw damage removal was shown technically feasible but not cost effective compared to wet chemical etching techniques.

A Computational Chemistry Database for Semiconductor Processing

NASA Technical Reports Server (NTRS)

Jaffe, R.; Meyyappan, M.; Arnold, J. O. (Technical Monitor)

1998-01-01

The concept of 'virtual reactor' or 'virtual prototyping' has received much attention recently in the semiconductor industry. Commercial codes to simulate thermal CVD and plasma processes have become available to aid in equipment and process design efforts, The virtual prototyping effort would go nowhere if codes do not come with a reliable database of chemical and physical properties of gases involved in semiconductor processing. Commercial code vendors have no capabilities to generate such a database, rather leave the task to the user of finding whatever is needed. While individual investigations of interesting chemical systems continue at Universities, there has not been any large scale effort to create a database. In this presentation, we outline our efforts in this area. Our effort focuses on the following five areas: 1. Thermal CVD reaction mechanism and rate constants. 2. Thermochemical properties. 3. Transport properties.4. Electron-molecule collision cross sections. and 5. Gas-surface interactions.

Numerical simulation of physicochemical interactions between oxygen atom and phosphatidylcholine due to direct irradiation of atmospheric pressure nonequilibrium plasma to biological membrane with quantum mechanical molecular dynamics

NASA Astrophysics Data System (ADS)

Uchida, Satoshi; Yoshida, Taketo; Tochikubo, Fumiyoshi

2017-10-01

Plasma medicine is one of the most attractive applications using atmospheric pressure nonequilibrium plasma. With respect to direct contact of the discharge plasma with a biological membrane, reactive oxygen species play an important role in induction of medical effects. However, complicated interactions between the plasma radicals and membrane have not been understood well. In the present work, we simulated elemental processes at the first stage of physicochemical interactions between oxygen atom and phosphatidylcholine using the quantum mechanical molecular dynamics code in a general software AMBER. The change in the above processes was classified according to the incident energy of oxygen atom. At an energy of 1 eV, the abstraction of a hydrogen atom and recombination to phosphatidylcholine were simultaneously occurred in chemical attachment of incident oxygen atom. The exothermal energy of the reaction was about 80% of estimated one based on the bond energies of ethane. An oxygen atom over 10 eV separated phosphatidylcholine partially. The behaviour became increasingly similar to physical sputtering. The reaction probability of oxygen atom was remarkably high in comparison with that of hydrogen peroxide. These results suggest that we can uniformly estimate various physicochemical dynamics of reactive oxygen species against membrane lipids.

Synthesis of diamond films at low temperature and study of nonlinear dynamic synthesis process

NASA Astrophysics Data System (ADS)

Zhao, Qingxun; Shang, Yong; Dong, Lifang; Fu, Guangsheng; Yan, Zheng; Yang, Jingfa

2002-09-01

In this paper, the experimental synthesis of diamond films and optical emission spectroscopy (OES) of the gaseous phase species are studied in the range of substrate temperature from Ts = 300°C to 850°C. The high quality sub-microcrystalline diamond films are successfully deposited at substrate temperature (330 ≍ 340)°C by adopting glow plasma assisted hot filament chemical vapor deposition (GPCVD). For the first time, in situ OES is applied to diagnose weak signal of GPCVD system when CH4 and H2 are used as the input gas, and the reactive species are identified in diamond growth processes. A primary model of diamond films growing at low temperature is presented by studying dynamic behavior for nonequilibrium plasma reactions.

Controlled alignment of carbon nanofibers in a large-scale synthesis process

NASA Astrophysics Data System (ADS)

Merkulov, Vladimir I.; Melechko, A. V.; Guillorn, M. A.; Simpson, M. L.; Lowndes, D. H.; Whealton, J. H.; Raridon, R. J.

2002-06-01

Controlled alignment of catalytically grown carbon nanofibers (CNFs) at a variable angle to the substrate during a plasma-enhanced chemical vapor deposition process is achieved. The CNF alignment is controlled by the direction of the electric field lines during the synthesis process. Off normal CNF orientations are achieved by positioning the sample in the vicinity of geometrical features of the sample holder, where bending of the electric field lines occurs. The controlled growth of kinked CNFs that consist of two parts aligned at different angles to the substrate normal also is demonstrated.

Oxidation of S(IV) in Seawater by Pulsed High Voltage Discharge Plasma with TiO2/Ti Electrode as Catalyst

NASA Astrophysics Data System (ADS)

Gong, Jianying; Zhang, Xingwang; Wang, Xiaoping; Lei, Lecheng

2013-12-01

Oxidation of S(IV) to S(VI) in the effluent of a flue gas desulfurization(FGD) system is very critical for industrial applications of seawater FGD. This paper reports a pulsed corona discharge oxidation process combined with a TiO2 photocatalyst to convert S(IV) to S(VI) in artificial seawater. Experimental results show that the oxidation of S(IV) in artificial seawater is enhanced in the pulsed discharge plasma process through the application of TiO2 coating electrodes. The oxidation rate of S(IV) using Ti metal as a ground electrode is about 2.0×10-4 mol · L-1 · min-1, the oxidation rate using TiO2/Ti electrode prepared by annealing at 500°C in air is 4.5×10-4 mol · L-1 · min-1, an increase with a factor 2.25. The annealing temperature for preparing TiO2/Ti electrode has a strong effect on the oxidation of S(IV) in artificial seawater. The results of in-situ emission spectroscopic analysis show that chemically active species (i.e. hydroxyl radicals and oxygen radicals) are produced in the pulsed discharge plasma process. Compared with the traditional air oxidation process and the sole plasma-induced oxidation process, the combined application of TiO2 photocatalysts and a pulsed high-voltage electrical discharge process is useful in enhancing the energy and conversion efficiency of S(IV) for the seawater FGD system.

Optimized plasma etch window of block copolymers and neutral brush layers for enhanced direct self-assembly pattern transfer into a hardmask layer

NASA Astrophysics Data System (ADS)

Brakensiek, Nickolas; Xu, Kui; Sweat, Daniel; Hockey, Mary Ann

2018-03-01

Directed self-assembly (DSA) of block copolymers (BCPs) is one of the most promising patterning technologies for future lithography nodes. However, one of the biggest challenges to DSA is the pattern transfer by plasma etching from BCP to hardmask (HM) because the etch selectivity between BCP and neutral brush layer underneath is usually not high enough to enable robust pattern transfer. This paper will explore the plasma etch conditions of both BCPs and neutral brush layers that may improve selectivity and allow a more robust pattern transfer of DSA patterns into the hardmask layer. The plasma etching parameters that are under investigation include the selection of oxidative or reductive etch chemistries, as well as plasma gas pressure, power, and gas mixture fractions. Investigation into the relationship between BCP/neutral brush layer materials with varying chemical compositions and the plasma etching conditions will be highlighted. The culmination of this work will demonstrate important etch parameters that allow BCPs and neutral brush layers to be etched into the underlying hardmask layer with a large process window.

Influence of emissivity on behavior of metallic dust particles in plasmas

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tanaka, Y.; Smirnov, R. D.; Pigarov, A. Yu.

Influence of thermal radiation emissivity on the lifetime of a dust particle in plasmas is investigated for different fusion relevant metals (Li, Be, Mo, and W). The thermal radiation is one of main cooling mechanisms of the dust in plasmas especially for dust with evaporation temperature higher than 2500 K. In this paper, the temperature- and radius-dependent emissivity of dust particles is calculated using Mie theory and temperature-dependent optical constants for the above metallic materials. The lifetime of a dust particle in uniform plasmas is estimated with the calculated emissivity using the dust transport code DUSTT[A. Pigarov et al., Physicsmore » of Plasmas 12, 122508 (2005)], considering other dust cooling and destruction processes such as physical and chemical sputtering, melting and evaporation, electron emission etc. The use of temperature-dependent emissivity calculated with Mie theory provides a longer lifetime of the refractory metal dust particle compared with that obtained using conventional emissivity constants in the literature. The dynamics of heavy metal dust particles are also presented using the calculated emissivity in a tokamak plasma.« less

Clearing of ventilating emissions in low temperature environment of plasma

NASA Astrophysics Data System (ADS)

Mansurov, R. Sh; Rafalskaya, T. A.

2017-11-01

The method of high-temperature processing of streams of the ventilating air which is a subject clearing from organic pollutions is developed. Data about its efficiency, including on a number of economic parameters are obtained. Results of work are recommended for use, first of all, by development clearing plasma-thermal reactors (CPTR) for clearing air, especially from toxic substances, and also for large technological clearing installations, containing organic ventilating emissions (OVE). It is created experimental CPTR. Laws of the expiration of a plasma jet in stream of OVE limited by cylindrical walls, water-cooled channel are experimentally investigated. Dependences of a trajectory and long-range the plasma jet blown radially in stream of OVE are received. Heat exchange of stream of OVE with walls of CPTR after blowing a plasma jet is experimentally investigated; dependences of distribution of temperatures on length of a reactor and a thermal stream in a wall of channel of CPTR are received. Are investigated chemical compound of OVE after plasma-thermal clearing, some experimental data by formation of oxides of nitrogen and mono-oxide of carbon during clearing are received.

Positron induced scattering cross sections for hydrocarbons relevant to plasma

NASA Astrophysics Data System (ADS)

Singh, Suvam; Antony, Bobby

2018-05-01

This article explores positron scattering cross sections by simple hydrocarbons such as ethane, ethene, ethyne, propane, and propyne. Chemical erosion processes occurring on the surface due to plasma-wall interactions are an abundant source of hydrocarbon molecules which contaminate the hydrogenic plasma. These hydrocarbons play an important role in the edge plasma region of Tokamak and ITER. In addition to this, they are also one of the major components in the planetary atmospheres and astrophysical mediums. The present work focuses on calculation of different positron impact interactions with simple hydrocarbons in terms of the total cross section (Qtot), elastic cross section (Qel), direct ionization cross section (Qion), positronium formation cross section (Qps), and total ionization cross section (Qtion). Knowing that the positron-plasma study is one of the trending fields, the calculated data have diverse plasma and astrophysical modeling applications. A comprehensive study of Qtot has been provided where the inelastic cross sections have been reported for the first time. Comparisons are made with those available from the literature, and a good agreement is obtained with the measurements.

Insulators obtained by electron cyclotron resonance plasmas on Si or GaAs

DOE Office of Scientific and Technical Information (OSTI.GOV)

Diniz, J.A.; Doi, I.; Swart, J.W

2003-03-15

Silicon oxynitride (SiO{sub x}N{sub y}) and nitride (SiN{sub x}) insulators have been deposited or grown (with or without silane in the gas mixture, respectively) by electron cyclotron resonance (ECR) plasmas on Si and/or GaAs substrates at room temperature (20 deg. C) and low pressures (up to 10 mTorr). Chemical bonding characteristics of the SiO{sub x}N{sub y} and SiN{sub x} films were evaluated using Fourier transform infrared spectrometry (FTIR). The profile measurements determined the film thickness, the deposition (or oxidation) rate and the etch rates in buffered HF (BHF). The refractive indexes and the thicknesses were determined by ellipsometry. The effectivemore » interface charge densities were determined by capacitance-voltage (C-V) measurements. With these processes and analyses, different films were obtained and optimized. Suitable gate insulators for metal-insulator-semiconductor (MIS) devices with low interface charge densities were developed: (a) SiN{sub x} films deposited by ECR-chemical vapor deposition (ECR-PECVD) on GaAs substrates; (b) SiO{sub x}N{sub y} insulators obtained by low-energy molecular nitrogen ion ({sup 28}N{sub 2}{sup +}) implantation (energy of 5 keV and dose of 1x10{sup 15}/cm{sup 2}) in Si substrates prior to high-density O{sub 2} ECR plasma oxidation; and (c) SiO{sub x}N{sub y} insulators grown (without silane in the gas mixture) by O{sub 2}/N{sub 2}/Ar ECR plasma 'oxynitridation'. Furthermore, some SiN{sub x} films also present very good masking characteristics for local oxidation of silicon process.« less

High degree reduction and restoration of graphene oxide on SiO2 at low temperature via remote Cu-assisted plasma treatment.

PubMed

Obata, Seiji; Sato, Minoru; Akada, Keishi; Saiki, Koichiro

2018-06-15

A high throughput synthesis method of graphene has been required for a long time to apply graphene to industrial applications. Of the various synthesis methods, the chemical exfoliation of graphite via graphene oxide (GO) is advantageous as far as productivity is concerned; however, the quality of the graphene produced by this method is far inferior to that synthesized by other methods, such as chemical vapor deposition on metals. Developing an effective reduction and restoration method for GO on dielectric substrates has been therefore a key issue. Here, we present a method for changing GO deposited on a dielectric substrate into high crystallinity graphene at 550 °C; this method uses CH 4 /H 2 plasma and a Cu catalyst. We found that Cu remotely catalyzed the high degree reduction and restoration of GO on SiO 2 and the effect ranged over at least 8 mm. With this method, field-effect transistor devices can be fabricated without any post treatment such as a transfer process. This plasma treatment increased electron and hole mobilities of GO to 480 cm 2 V -1 s -1 and 460 cm 2 V -1 s -1 respectively; these values were more than 50 times greater than that of conventional reduced GO. Furthermore, the on-site conversion ensured that the shape of the GO sheets remained unchanged after the treatment. This plasma treatment realizes the high throughput synthesis of a desired shaped graphene on any substrate without any residue and damage being caused by the transfer process; as such, it expands the potential applicability of graphene.

High degree reduction and restoration of graphene oxide on SiO2 at low temperature via remote Cu-assisted plasma treatment

NASA Astrophysics Data System (ADS)

Obata, Seiji; Sato, Minoru; Akada, Keishi; Saiki, Koichiro

2018-06-01

A high throughput synthesis method of graphene has been required for a long time to apply graphene to industrial applications. Of the various synthesis methods, the chemical exfoliation of graphite via graphene oxide (GO) is advantageous as far as productivity is concerned; however, the quality of the graphene produced by this method is far inferior to that synthesized by other methods, such as chemical vapor deposition on metals. Developing an effective reduction and restoration method for GO on dielectric substrates has been therefore a key issue. Here, we present a method for changing GO deposited on a dielectric substrate into high crystallinity graphene at 550 °C this method uses CH4/H2 plasma and a Cu catalyst. We found that Cu remotely catalyzed the high degree reduction and restoration of GO on SiO2 and the effect ranged over at least 8 mm. With this method, field-effect transistor devices can be fabricated without any post treatment such as a transfer process. This plasma treatment increased electron and hole mobilities of GO to 480 cm2 V‑1 s‑1 and 460 cm2 V‑1 s‑1 respectively; these values were more than 50 times greater than that of conventional reduced GO. Furthermore, the on-site conversion ensured that the shape of the GO sheets remained unchanged after the treatment. This plasma treatment realizes the high throughput synthesis of a desired shaped graphene on any substrate without any residue and damage being caused by the transfer process; as such, it expands the potential applicability of graphene.

Dry soldering with hot filament produced atomic hydrogen

DOEpatents

Panitz, Janda K. G.; Jellison, James L.; Staley, David J.

1995-01-01

A system for chemically transforming metal surface oxides to metal that is especially, but not exclusively, suitable for preparing metal surfaces for dry soldering and solder reflow processes. The system employs one or more hot, refractory metal filaments, grids or surfaces to thermally dissociate molecular species in a low pressure of working gas such as a hydrogen-containing gas to produce reactive species in a reactive plasma that can chemically reduce metal oxides and form volatile compounds that are removed in the working gas flow. Dry soldering and solder reflow processes are especially applicable to the manufacture of printed circuit boards, semiconductor chip lead attachment and packaging multichip modules. The system can be retrofitted onto existing metal treatment ovens, furnaces, welding systems and wave soldering system designs.

Young Stellar Objects from Soft to Hard X-rays

NASA Astrophysics Data System (ADS)

Güdel, Manuel

2009-05-01

Magnetically active stars are the sites of efficient particle acceleration and plasma heating, processes that have been studied in detail in the solar corona. Investigation of such processes in young stellar objects is much more challenging due to various absorption processes. There is, however, evidence for violent magnetic energy release in very young stellar objects. The impact on young stellar environments (e.g., circumstellar disk heating and ionization, operation of chemical networks, photoevaporation) may be substantial. Hard X-ray devices like those carried on Simbol-X will establish a basis for detailed studies of these processes.

Trap density of GeNx/Ge interface fabricated by electron-cyclotron-resonance plasma nitridation

NASA Astrophysics Data System (ADS)

Fukuda, Yukio; Otani, Yohei; Toyota, Hiroshi; Ono, Toshiro

2011-07-01

We have investigated GeNx/Ge interface properties using Si3N4(7 nm)/GeNx(2 nm)/Ge metal-insulator-semiconductor structures fabricated by the plasma nitridation of Ge substrates using an electron-cyclotron-resonance-generated nitrogen plasma. The interface trap density (Dit) measured by the conductance method is found to be distributed symmetrically in the Ge band gap with a minimum Dit value lower than 3 × 1011 cm-2eV-1 near the midgap. This result may lead to the development of processes for the fabrication of p- and n-Ge Schottky-barrier (SB) source/drain metal-insulator-semiconductor field-effect transistors using chemically and thermally robust GeNx dielectrics as interlayers for SB source/drain contacts and high-κ gate dielectrics.

Hydrodynamic chromatography coupled to single-particle ICP-MS for the simultaneous characterization of AgNPs and determination of dissolved Ag in plasma and blood of burn patients.

PubMed

Roman, Marco; Rigo, Chiara; Castillo-Michel, Hiram; Munivrana, Ivan; Vindigni, Vincenzo; Mičetić, Ivan; Benetti, Federico; Manodori, Laura; Cairns, Warren R L

2016-07-01

Silver nanoparticles (AgNPs) are increasingly used in medical devices as innovative antibacterial agents, but no data are currently available on their chemical transformations and fate in vivo in the human body, particularly on their potential to reach the circulatory system. To study the processes involving AgNPs in human plasma and blood, we developed an analytical method based on hydrodynamic chromatography (HDC) coupled to inductively coupled plasma mass spectrometry (ICP-MS) in single-particle detection mode. An innovative algorithm was implemented to deconvolute the signals of dissolved Ag and AgNPs and to extrapolate a multiparametric characterization of the particles in the same chromatogram. From a single injection, the method provides the concentration of dissolved Ag and the distribution of AgNPs in terms of hydrodynamic diameter, mass-derived diameter, number and mass concentration. This analytical approach is robust and suitable to study quantitatively the dynamics and kinetics of AgNPs in complex biological fluids, including processes such as agglomeration, dissolution and formation of protein coronas. The method was applied to study the transformations of AgNP standards and an AgNP-coated dressing in human plasma, supported by micro X-ray fluorescence (μXRF) and micro X-ray absorption near-edge spectroscopy (μXANES) speciation analysis and imaging, and to investigate, for the first time, the possible presence of AgNPs in the blood of three burn patients treated with the same dressing. Together with our previous studies, the results strongly support the hypothesis that the systemic mobilization of the metal after topical administration of AgNPs is driven by their dissolution in situ. Graphical Abstract Simplified scheme of the combined analytical approach adopted for studying the chemical dynamics of AgNPs in human plasma/blood.

Surface modification of closed plastic bags for adherent cell cultivation

NASA Astrophysics Data System (ADS)

Lachmann, K.; Dohse, A.; Thomas, M.; Pohl, S.; Meyring, W.; Dittmar, K. E. J.; Lindenmeier, W.; Klages, C.-P.

2011-07-01

In modern medicine human mesenchymal stem cells are becoming increasingly important. However, a successful cultivation of this type of cells is only possible under very specific conditions. Of great importance, for instance, are the absence of contaminants such as foreign microbiological organisms, i.e., sterility, and the chemical functionalization of the ground on which the cells are grown. As cultivation of these cells makes high demands, a new procedure for cell cultivation has been developed in which closed plastic bags are used. For adherent cell growth chemical functional groups have to be introduced on the inner surface of the plastic bag. This can be achieved by a new, atmospheric-pressure plasma-based method presented in this paper. The method which was developed jointly by the Fraunhofer IST and the Helmholtz HZI can be implemented in automated equipment as is also shown in this contribution. Plasma process gases used include helium or helium-based gas mixtures (He + N2 + H2) and vapors of suitable film-forming agents or precursors such as APTMS, DACH, and TMOS in helium. The effect of plasma treatment is investigated by FTIR-ATR spectroscopy as well as surface tension determination based on contact angle measurements and XPS. Plasma treatment in nominally pure helium increases the surface tension of the polymer foil due to the presence of oxygen traces in the gas and oxygen diffusing through the gas-permeable foil, respectively, reacting with surface radical centers formed during contact with the discharge. Primary amino groups are obtained on the inner surface by treatment in mixtures with nitrogen and hydrogen albeit their amount is comparably small due to diffusion of oxygen through the gas-permeable bag, interfering with the plasma-amination process. Surface modifications introducing amino groups on the inner surface turned out to be most efficient in the promotion of cell growth.

Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C4F8 and Ar/CHF3 plasma

NASA Astrophysics Data System (ADS)

Metzler, Dominik; Li, Chen; Engelmann, Sebastian; Bruce, Robert L.; Joseph, Eric A.; Oehrlein, Gottlieb S.

2017-02-01

With the increasing interest in establishing directional etching methods capable of atomic scale resolution for fabricating highly scaled electronic devices, the need for development and characterization of atomic layer etching processes, or generally etch processes with atomic layer precision, is growing. In this work, a flux-controlled cyclic plasma process is used for etching of SiO2 and Si at the Angstrom-level. This is based on steady-state Ar plasma, with periodic, precise injection of a fluorocarbon (FC) precursor (C4F8 and CHF3) and synchronized, plasma-based Ar+ ion bombardment [D. Metzler et al., J. Vac. Sci. Technol., A 32, 020603 (2014) and D. Metzler et al., J. Vac. Sci. Technol., A 34, 01B101 (2016)]. For low energy Ar+ ion bombardment conditions, physical sputter rates are minimized, whereas material can be etched when FC reactants are present at the surface. This cyclic approach offers a large parameter space for process optimization. Etch depth per cycle, removal rates, and self-limitation of removal, along with material dependence of these aspects, were examined as a function of FC surface coverage, ion energy, and etch step length using in situ real time ellipsometry. The deposited FC thickness per cycle is found to have a strong impact on etch depth per cycle of SiO2 and Si but is limited with regard to control over material etching selectivity. Ion energy over the 20-30 eV range strongly impacts material selectivity. The choice of precursor can have a significant impact on the surface chemistry and chemically enhanced etching. CHF3 has a lower FC deposition yield for both SiO2 and Si and also exhibits a strong substrate dependence of FC deposition yield, in contrast to C4F8. The thickness of deposited FC layers using CHF3 is found to be greater for Si than for SiO2. X-ray photoelectron spectroscopy was used to study surface chemistry. When thicker FC films of 11 Å are employed, strong changes of FC film chemistry during a cycle are seen whereas the chemical state of the substrate varies much less. On the other hand, for FC film deposition of 5 Å for each cycle, strong substrate surface chemical changes are seen during an etching cycle. The nature of this cyclic etching with periodic deposition of thin FC films differs significantly from conventional etching with steady-state FC layers since surface conditions change strongly throughout each cycle.

Effects of estrogenic (o,p'-DDT; octylphenol) and anti-androgenic (p,p'-DDE) chemicals on indicators of endocrine status in juvenile male summer flounder (Paralichthys dentatus).

PubMed

Mills, L J; Gutjahr-Gobell, R E; Haebler, R A; Horowitz, D J; Jayaraman, S; Pruell, R J; McKinney, R A; Gardner, G R; Zaroogian, G E

2001-04-01

Laboratory experiments were conducted with male summer flounder to assess the value of selected measures of endocrine status in fish as indicators of exposure to endocrine-disrupting contaminants. Effects of 1,1,1-trichloro-2-(p-chlorophenyl)-2-(o-chlorophenyl) ethane (o,p'-DDT), octylphenol and 1,1-dichloro-2,2-bis (p-chlorophenyl) ethylene (p,p'-DDE) on hepatosomatic and gonadosomatic indices, plasma steroid hormone levels, vitellogenin production, and gonadal development were evaluated in laboratory-raised, juvenile male summer flounder. Flounder were injected twice with test chemical in a coconut oil carrier. Each chemical was tested at three different concentrations. Estrogenic (o,p'-DDT; octylphenol) and anti-androgenic (p,p'-DDE) chemicals were evaluated alone and in combination (octylphenol plus o,p'-DDT or p,p'-DDE). Additionally, some fish were treated with the natural ligand for the estrogen receptor, 17beta-estradiol. Blood and tissues from different fish in each treatment were sampled 4, 6 and 8 weeks after the first injection. Fish exposed to a combination of o,p'-DDT plus octylphenol were also sampled after 15 weeks. In all cases, responses of fish exposed to a test chemical were compared to control fish sampled at the same time. The following significant differences, relative to controls, were observed in at least one sampling time or at least one concentration of chemical. 17beta-Estradiol-treated flounder exhibited decreased gonadosomatic index (GSI), altered hepatosomatic index (HSI), elevated plasma estradiol, reduced plasma testosterone, and high levels of plasma vitellogenin. Fish treated with o,p'-DDT showed lower GSI, no change in HSI or plasma estradiol, depression of plasma testosterone, and induction of vitellogenesis. Octylphenol treatment resulted in lower GSI, no change in HSI, initially increased plasma estradiol and decreased testosterone, and no vitellogenin production. p,p'-DDE treatment did not significantly alter any indicator relative to controls. In experiments using combinations of chemicals, flounder receiving o,p'-DDT plus octylphenol had lower GSI after 8 weeks and elevated plasma estradiol after 15 weeks exposure. Fish treated with p,p'-DDE plus octylphenol for 8 weeks exhibited a significantly lower GSI. Overall, lower GSI and plasma testosterone levels, relative to controls, were consistent indicators of exposure to estrogenic chemicals in juvenile male flounder. No indicators were found that would identify exposure to the mammalian anti-androgen p,p'-DDE.

Mixed Material Plasma-Surface Interactions in ITER: Recent Results from the PISCES Group

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tynan, George R.; Baldwin, Matthew; Doerner, Russell

This paper summarizes recent PISCES studies focused on the effects associated with mixed species plasmas that are similar in composition to what one might expect in ITER. Formation of nanometer scale whiskerlike features occurs in W surfaces exposed to pure He and mixed D/He plasmas and appears to be associated with the formation of He nanometer-scaled bubbles in the W surface. Studies of Be-W alloy formation in Be-seeded D plasmas suggest that this process may be important in ITER all metal wall operational scenarios. Studies also suggest that BeD formation via chemical sputtering of Be walls may be an importantmore » first wall erosion mechanism. D retention in ITER mixed materials has also been studied. The D release behavior from beryllium co-deposits does not appear to be a diffusion dominated process, but instead is consistent with thermal release from a number of variable trapping energy sites. As a result, the amount of tritium remaining in codeposits in ITER after baking will be determined by the maximum temperature achieved, rather than by the duration of the baking cycle.« less

Synthesis and Phase Stability of Scandia, Gadolinia, and Ytterbia Co-doped Zirconia for Thermal Barrier Coating Application

NASA Astrophysics Data System (ADS)

Li, Qi-Lian; Cui, Xiang-Zhong; Li, Shu-Qing; Yang, Wei-Hua; Wang, Chun; Cao, Qian

2015-01-01

Scandia, gadolinia, and ytterbia co-doped zirconia (SGYZ) ceramic powder was synthesized by chemical co-precipitation and calcination processes for application in thermal barrier coatings to promote the durability of gas turbines. The ceramic powder was agglomerated and sintered at 1150 °C for 2 h, and the powder exhibited good flowability and apparent density to be suitable for plasma spraying process. The microstructure, morphology and phase stability of the powder and plasma-sprayed SGYZ coatings were analyzed by means of scanning electron microscope and x-ray diffraction. Thermal conductivity of plasma-sprayed SGYZ coatings was measured. The results indicated that the SGYZ ceramic powder and the coating exhibit excellent stability to retain single non-transformable tetragonal zirconia even after high temperature (1400 °C) exposure for 500 h and do not undergo a tetragonal-to-monoclinic phase transition upon cooling. Furthermore, the plasma-sprayed SGYZ coating also exhibits lower thermal conductivity than yttria stabilized zirconia coating currently used in gas turbine engine industry. SGYZ can be explored as a candidate material of ultra-high temperature thermal barrier coating for advanced gas turbine engines.

Behavior of deuterium retention and surface morphology for VPS–W/F82H

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yasuhisa Oya; Masashi Shimada; Tomonori Tokunaga

The deuterium (D) retention for Vacuum Plasma Spray (VPS)–tungsten (W)/F82H was studied using two different implantation methods, namely D plasma exposure and View the MathML source implantation. The D retention for polished VPS–W/F82H after plasma exposure was found to be reduced compared to that for polycrystalline tungsten. Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) observations indicated that porous structures around grain boundaries and the interface between VPS–W layers would be potential D diffusion paths, leading to low D retention. In the case of View the MathML source implantation, the shape of D2 TDS spectrum was almost the samemore » as that for D plasma-exposed VPS–W/F82H; however, the D retention was quite high for unpolished VPS–W/F82H, indicating that most of D was trapped by the oxide layer, which was produced by the VPS process. The reduction of surface area due to the polishing process also reduces D retention for VPS–W/F82H. These results indicate that controlling the surface chemical states is important for the reduction of tritium retention for future fusion reactors.« less

Pathogen Reduction in Human Plasma Using an Ultrashort Pulsed Laser

PubMed Central

Tsen, Shaw-Wei D.; Kingsley, David H.; Kibler, Karen; Jacobs, Bert; Sizemore, Sara; Vaiana, Sara M.; Anderson, Jeanne; Tsen, Kong-Thon; Achilefu, Samuel

2014-01-01

Pathogen reduction is a viable approach to ensure the continued safety of the blood supply against emerging pathogens. However, the currently licensed pathogen reduction techniques are ineffective against non-enveloped viruses such as hepatitis A virus, and they introduce chemicals with concerns of side effects which prevent their widespread use. In this report, we demonstrate the inactivation of both enveloped and non-enveloped viruses in human plasma using a novel chemical-free method, a visible ultrashort pulsed laser. We found that laser treatment resulted in 2-log, 1-log, and 3-log reductions in human immunodeficiency virus, hepatitis A virus, and murine cytomegalovirus in human plasma, respectively. Laser-treated plasma showed ≥70% retention for most coagulation factors tested. Furthermore, laser treatment did not alter the structure of a model coagulation factor, fibrinogen. Ultrashort pulsed lasers are a promising new method for chemical-free, broad-spectrum pathogen reduction in human plasma. PMID:25372037

Plasma enhanced chemical vapor deposition (PECVD) method of forming vanadium oxide films and vanadium oxide thin-films prepared thereby

DOEpatents

Zhang, Ji-Guang; Tracy, C. Edwin; Benson, David K.; Turner, John A.; Liu, Ping

2000-01-01

A method is disclosed of forming a vanadium oxide film on a substrate utilizing plasma enhanced chemical vapor deposition. The method includes positioning a substrate within a plasma reaction chamber and then forming a precursor gas comprised of a vanadium-containing chloride gas in an inert carrier gas. This precursor gas is then mixed with selected amounts of hydrogen and oxygen and directed into the reaction chamber. The amounts of precursor gas, oxygen and hydrogen are selected to optimize the final properties of the vanadium oxide film An rf plasma is generated within the reaction chamber to chemically react the precursor gas with the hydrogen and the oxygen to cause deposition of a vanadium oxide film on the substrate while the chamber deposition pressure is maintained at about one torr or less. Finally, the byproduct gases are removed from the plasma reaction chamber.

First experimental observations on melting and chemical modification of volcanic ash during lightning interaction.

PubMed

Mueller, S P; Helo, C; Keller, F; Taddeucci, J; Castro, J M

2018-01-23

Electrification in volcanic ash plumes often leads to syn-eruptive lightning discharges. High temperatures in and around lightning plasma channels have the potential to chemically alter, re-melt, and possibly volatilize ash fragments in the eruption cloud. In this study, we experimentally simulate temperature conditions of volcanic lightning in the laboratory, and systematically investigate the effects of rapid melting on the morphology and chemical composition of ash. Samples of different size and composition are ejected towards an artificially generated electrical arc. Post-experiment ash morphologies include fully melted spheres, partially melted particles, agglomerates, and vesiculated particles. High-speed imaging reveals various processes occurring during the short lightning-ash interactions, such as particle melting and rounding, foaming, and explosive particle fragmentation. Chemical analyses of the flash-melted particles reveal considerable bulk loss of Cl, S, P and Na through thermal vaporization. Element distribution patterns suggest convection as a key process of element transport from the interior of the melt droplet to rim where volatiles are lost. Modeling the degree of sodium loss delivers maximum melt temperatures between 3290 and 3490 K. Our results imply that natural lighting strikes may be an important agent of syn-eruptive morphological and chemical processing of volcanic ash.

Understanding the Mechanism of SiC Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Developing Routes toward SiC Atomic Layer Deposition (ALD) with Density Functional Theory.

PubMed

Filatova, Ekaterina A; Hausmann, Dennis; Elliott, Simon D

2018-05-02

Understanding the mechanism of SiC chemical vapor deposition (CVD) is an important step in investigating the routes toward future atomic layer deposition (ALD) of SiC. The energetics of various silicon and carbon precursors reacting with bare and H-terminated 3C-SiC (011) are analyzed using ab initio density functional theory (DFT). Bare SiC is found to be reactive to silicon and carbon precursors, while H-terminated SiC is found to be not reactive with these precursors at 0 K. Furthermore, the reaction pathways of silane plasma fragments SiH 3 and SiH 2 are calculated along with the energetics for the methane plasma fragments CH 3 and CH 2 . SiH 3 and SiH 2 fragments follow different mechanisms toward Si growth, of which the SiH 3 mechanism is found to be more thermodynamically favorable. Moreover, both of the fragments were found to show selectivity toward the Si-H bond and not C-H bond of the surface. On the basis of this, a selective Si deposition process is suggested for silicon versus carbon-doped silicon oxide surfaces.

Spectroscopic determinations of carbon fluxes, sources, and shielding in the DIII-D divertors

NASA Astrophysics Data System (ADS)

Isler, R. C.; Colchin, R. J.; Brooks, N. H.; Evans, T. E.; West, W. P.; Whyte, D. G.

2001-10-01

The most important mechanisms for eroding plasma-facing components (PFCs) and introducing carbon into tokamak divertors are believed to be physical sputtering, chemical sputtering, sublimation, and radiation enhance sublimation (RES). The relative importance of these processes has been investigated by analyzing the spectral emission rates and the effective temperatures of CI, CD, and C2 under several operating conditions in the DIII-D tokamak [Plasma Physics Controlled Nuclear Fusion Research, 1986 (International Atomic Energy Agency, Vienna, 1987), Vol. I, p. 159; Proceedings of the 18th IEEE/NPSS Symposium on Fusion Engineering, Albuquerque (Institute of Electrical and Electronic Engineers, Piscataway, 1999), p. 515]. Discrimination of chemical sputtering from physical sputtering is accomplished by quantitatively relating the fraction of CI influxes expected from dissociation of hydrocarbons to the measured CD and C2 influxes. Characteristics of sublimation are studied from carbon test samples heated to surface temperatures exceeding 2000 K. The shielding efficiency of carbon produced at the divertor target is assessed from comparison of fluxes of neutral atoms and ions; approximately 95% of the primary influx appears to be redeposited before being transported far enough upstream to fuel the core plasma.

Spectroscopic determinations of carbon fluxes, sources, and shielding in the DIII-D divertors

DOE Office of Scientific and Technical Information (OSTI.GOV)

Isler, R. C.; Colchin, R. J.; Brooks, N. H.

2001-10-01

The most important mechanisms for eroding plasma-facing components (PFCs) and introducing carbon into tokamak divertors are believed to be physical sputtering, chemical sputtering, sublimation, and radiation enhance sublimation (RES). The relative importance of these processes has been investigated by analyzing the spectral emission rates and the effective temperatures of CI, CD, and C{sub 2} under several operating conditions in the DIII-D tokamak [Plasma Physics Controlled Nuclear Fusion Research, 1986 (International Atomic Energy Agency, Vienna, 1987), Vol. I, p. 159; Proceedings of the 18th IEEE/NPSS Symposium on Fusion Engineering, Albuquerque (Institute of Electrical and Electronic Engineers, Piscataway, 1999), p. 515]. Discriminationmore » of chemical sputtering from physical sputtering is accomplished by quantitatively relating the fraction of CI influxes expected from dissociation of hydrocarbons to the measured CD and C{sub 2} influxes. Characteristics of sublimation are studied from carbon test samples heated to surface temperatures exceeding 2000 K. The shielding efficiency of carbon produced at the divertor target is assessed from comparison of fluxes of neutral atoms and ions; approximately 95% of the primary influx appears to be redeposited before being transported far enough upstream to fuel the core plasma.« less

Microwave-Assisted Ignition for Improved Internal Combustion Engine Efficiency

NASA Astrophysics Data System (ADS)

DeFilippo, Anthony Cesar

The ever-present need for reducing greenhouse gas emissions associated with transportation motivates this investigation of a novel ignition technology for internal combustion engine applications. Advanced engines can achieve higher efficiencies and reduced emissions by operating in regimes with diluted fuel-air mixtures and higher compression ratios, but the range of stable engine operation is constrained by combustion initiation and flame propagation when dilution levels are high. An advanced ignition technology that reliably extends the operating range of internal combustion engines will aid practical implementation of the next generation of high-efficiency engines. This dissertation contributes to next-generation ignition technology advancement by experimentally analyzing a prototype technology as well as developing a numerical model for the chemical processes governing microwave-assisted ignition. The microwave-assisted spark plug under development by Imagineering, Inc. of Japan has previously been shown to expand the stable operating range of gasoline-fueled engines through plasma-assisted combustion, but the factors limiting its operation were not well characterized. The present experimental study has two main goals. The first goal is to investigate the capability of the microwave-assisted spark plug towards expanding the stable operating range of wet-ethanol-fueled engines. The stability range is investigated by examining the coefficient of variation of indicated mean effective pressure as a metric for instability, and indicated specific ethanol consumption as a metric for efficiency. The second goal is to examine the factors affecting the extent to which microwaves enhance ignition processes. The factors impacting microwave enhancement of ignition processes are individually examined, using flame development behavior as a key metric in determining microwave effectiveness. Further development of practical combustion applications implementing microwave-assisted spark technology will benefit from predictive models which include the plasma processes governing the observed combustion enhancement. This dissertation documents the development of a chemical kinetic mechanism for the plasma-assisted combustion processes relevant to microwave-assisted spark ignition. The mechanism includes an existing mechanism for gas-phase methane oxidation, supplemented with electron impact reactions, cation and anion chemical reactions, and reactions involving vibrationally-excited and electronically-excited species. Calculations using the presently-developed numerical model explain experimentally-observed trends, highlighting the relative importance of pressure, temperature, and mixture composition in determining the effectiveness of microwave-assisted ignition enhancement.

The Modification of Cellulosic Surface with Fatty Acids via Plasma Mediated Reactions

NASA Astrophysics Data System (ADS)

Nada, Ahmed Ali Ahmed

Much attention has been paid recently to understand the healing process made by the human body, in order to develop new approaches for promoting healing. The wound healing process includes four main phases, namely, hemostatic, inflammatory, proliferation, and remodeling, which take place successively. The human body can provide all the requirements of the healing process in normal wounds, unless there is a kind of deficiency of the skin function or massive fluid losses of vast wounds. Therefore, wound care of non-healing wounds has recently been the growing concern of many applications. The goal of this work is to explore the development of a new cellulose-based wound dressing composite that contain or release wound healing agents attained via dry textile chemical finishing techniques (thermal curing-plasma treatment). The synthesis of different wound healing agents derived from fatty acids and attached chemically to cellulose or even delivered through cyclodextrine modified cellulose are reported in this work. First, free fatty acids, which are obtained from commercial vegetable oils, were identified as wound healing agents. Many of these free acids are known to bind with and deactivate the proteases associated with inflammation at a wound site. Linoleic acid is extracted from commercial products of safflower seed oil while ricinoleic acid is obtained from castor oil. Conjugated linoleic acid was synthesized. Un-conjugated linoleic acid was used to prepare two derivatives namely linoleic azide and allylic ketone of linoleic acid. Different cellulose derivatives such as cellulose peroxide, iododeoxycellulose and cellulose diazonium salt in different degree of substitutions were synthesized in order to facilitate the free radical reaction with the fatty acid derivatives. New modified cellulosic products were synthesized by reacting the cellulosic and the linoleic acid derivatives via thermal or plasma technique and characterized by FT-IR ATR, the wettability test, etc. The cyto-compatiability of the new product was investigated using the cytotoxicity test to identify the cytotoxic potentials of the grafted samples. The highest yield was obtained in the thermal curing (at 140°C, 3 min, and a 20% solution of azide derivative -- 170°C, 3 min, and a 2.5% solution of allylic ketone derivatives) of the iododeoxycellulose fabrics with either linoleic azide or the allylic ketone derivative. Atmospheric plasma machines were used for this study such as NCAPS (dielectric barrier discharge plasma) and APJeT. APJet plasma machine was used in two different modes namely downstream and in-situ. Although, the plasma treatment uses a lower energy to achieve the chemical reactions between the two components, the APJet obtained good results in the in-situ mode (at 800 Watts/cm3 RF power, 45 sec. exposure time) while retaining sufficient tensile strength. In general samples treated with the allylic ketone of linoleic acid treated samples showed higher graft yield than the azide derivative, especially those treated via thermal curing. Moreover, they are more cytologically compatible than the plasma treated samples. In the course of producing a wound healing product that contains or releases fatty acids, allylic beta-CD was synthesized for first time as a textile finishing agent. Per(2, 3, 6- tri-O-allyl)-beta-CD was synthesized and characterized using spectral analysis. Cellulosic derivatives were treated with per(2, 3, 6- tri-O-allyl)-beta-CD via either pad-thermofixation technique or plasma treatment. Thermal treatment showed superior efficiency over plasma techniques to activate the vinyl groups and creating a self-assembled CD network chemically bonded with the cellulose derivatives (at 180°C, 3 min, and a 20 % solution of Per(2, 3, 6- tri- O-allyl)-beta-CD). APJeT machine (in-situ mode) succeeded only to activate cellulose/ allylic CD reaction, but however, it could not offer enough energy to stimulate vinyl-vinyl reactions. Oleic acid with its semi-linear chemical structure tends to include in the CD cavity faster and to higher levels, than the others after 4 hrs at 25°C. At higher temperatures the equilibrium of free and included oleic acid shifts and a remarkable decrease in the total inclusion was observed. However, ricinoleic acid anions showed very poor tendency for inclusion either with high temperature or at long time which may be attributed to its chemical structure, which is too large for the CD cavities. Also, un-conjugated linoleic acid anions showed higher inclusion than the conjugated ones. MMT assay was used to determine the cyto- compatibility for the newly modified samples. Generally speaking, the highest fixation yields the highest cyto-compatibility of the treated samples. Iododeoxycellulose samples in both thermal and plasma curing reported high cyto-compatibility either with allylic ketone or azide derivative of linoleic acid over the other cellulose derivatives. Pure extracted fatty acids or included ones showed high cyto-compatibility towards L929 mouse cell line.

Chitin and Cellulose Processing in Low-Temperature Electron Beam Plasma.

PubMed

Vasilieva, Tatiana; Chuhchin, Dmitry; Lopatin, Sergey; Varlamov, Valery; Sigarev, Andrey; Vasiliev, Michael

2017-11-06

Polysaccharide processing by means of low-temperature Electron Beam Plasma (EBP) is a promising alternative to the time-consuming and environmentally hazardous chemical hydrolysis in oligosaccharide production. The present paper considers mechanisms of the EBP-stimulated destruction of crab shell chitin, cellulose sulfate, and microcrystalline cellulose, as well as characterization of the produced oligosaccharides. The polysaccharide powders were treated in oxygen EBP for 1-20 min at 40 °C in a mixing reactor placed in the zone of the EBP generation. The chemical structure and molecular mass of the oligosaccharides were analyzed by size exclusion and the reversed phase chromatography, FTIR-spectroscopy, XRD-, and NMR-techniques. The EBP action on original polysaccharides reduces their crystallinity index and polymerization degree. Water-soluble products with lower molecular weight chitooligosaccharides (weight-average molecular mass, M w = 1000-2000 Da and polydispersity index 2.2) and cellulose oligosaccharides with polymerization degrees 3-10 were obtained. The ¹H-NMR analysis revealed 25-40% deacetylation of the EBP-treated chitin and FTIR-spectroscopy detected an increase of carbonyl- and carboxyl-groups in the oligosaccharides produced. Possible reactions of β-1,4-glycosidic bonds' destruction due to active oxygen species and high-energy electrons are given.

Comparative proteome analysis of egg yolk plasma proteins during storage.

PubMed

Gao, Dan; Qiu, Ning; Liu, Yaping; Ma, Meihu

2017-06-01

Physical changes such as chicken egg white thinning and egg yolk flattening occur during storage, implying a decline in egg quality. To reveal the deteriorative process related to chicken egg internal quality, a comparative proteomic method was used in this study to analyze the alterations in egg yolk plasma proteins at different storage times (0, 20 and 40 days) under an ambient temperature of 22 ± 2 °C. Using two-dimensional electrophoresis followed by matrix-assisted laser desorption/ionization time-of-flight tandem mass spectrometry, 33 protein spots representing 12 proteins were identified with significant (P < 0.05) alterations in abundance at different storage times. The proteins that showed significant changes in abundance included serum albumin, vitellogenin fragments, IgY chains, ovalbumin, ovoinhibitor, α 2 -macroglobulin-like protein 1-like, hemopexin, transthyretin, apolipoprotein A-I and β 2 -glycoprotein I precursor. Accelerating degradation for most egg yolk plasma proteins was observed after prolonged storage (from day 20 to day 40). It is likely that the increased degradation of protease inhibitors such as ovoinhibitor and α 2 -macroglobulin-like protein 1-like during prolonged storage lead to an imbalance of protease and antiprotease in egg yolk, which may play a key role in the degradation of egg yolk proteins. These findings will provide an insight into the effects of storage on egg yolk protein changes and give a deeper understanding of the deteriorative process of chicken egg yolk. © 2016 Society of Chemical Industry. © 2016 Society of Chemical Industry.

Metal/Carbon Hybrid Nanostructures Produced from Plasma-Enhanced Chemical Vapor Deposition over Nafion-Supported Electrochemically Deposited Cobalt Nanoparticles

PubMed Central

Achour, Amine; Saeed, Khalid; Djouadi, Mohamed Abdou

2018-01-01

In this work, we report development of hybrid nanostructures of metal nanoparticles (NP) and carbon nanostructures with strong potential for catalysis, sensing, and energy applications. First, the etched silicon wafer substrates were passivated for subsequent electrochemical (EC) processing through grafting of nitro phenyl groups using para-nitrobenzene diazonium (PNBT). The X-ray photoelectron spectroscope (XPS) and atomic force microscope (AFM) studies confirmed presence of few layers. Cobalt-based nanoparticles were produced over dip or spin coated Nafion films under different EC reduction conditions, namely CoSO4 salt concentration (0.1 M, 1 mM), reduction time (5, 20 s), and indirect or direct EC reduction route. Extensive AFM examination revealed NP formation with different attributes (size, distribution) depending on electrochemistry conditions. While relatively large NP with >100 nm size and bimodal distribution were obtained after 20 s EC reduction in H3BO3 following Co2+ ion uptake, ultrafine NP (<10 nm) could be produced from EC reduction in CoSO4 and H3BO3 mixed solution with some tendency to form oxides. Different carbon nanostructures including few-walled or multiwalled carbon nanotubes (CNT) and carbon nanosheets were grown in a C2H2/NH3 plasma using the plasma-enhanced chemical vapor deposition technique. The devised processing routes enable size controlled synthesis of cobalt nanoparticles and metal/carbon hybrid nanostructures with unique microstructural features. PMID:29702583

Magnetosphere-ionosphere interactions: Near Earth manifestations of the plasma universe

NASA Technical Reports Server (NTRS)

Faelthammar, Carl-Gunne

1986-01-01

As the universe consists almost entirely of plasma, the understanding of astrophysical phenomena must depend critically on the understanding of how matter behaves in the plasma state. In situ observations in the near Earth cosmical plasma offer an excellent opportunity of gaining such understanding. The near Earth cosmical plasma not only covers vast ranges of density and temperature, but is the site of a rich variety of complex plasma physical processes which are activated as a results of the interactions between the magnetosphere and the ionosphere. The geomagnetic field connects the ionosphere, tied by friction to the Earth, and the magnetosphere, dynamically coupled to the solar wind. This causes an exchange of energy an momentum between the two regions. The exchange is executed by magnetic-field-aligned electric currents, the so-called Birkeland currents. Both directly and indirectly (through instabilities and particle acceleration) these also lead to an exchange of plasma, which is selective and therefore causes chemical separation. Another essential aspect of the coupling is the role of electric fields, especially magnetic field aligned (parallel) electric fields, which have important consequences both for the dynamics of the coupling and, especially, for energization of charged particles.

Formation of hydrophobic coating on glass surface using atmospheric pressure non-thermal plasma in ambient air

NASA Astrophysics Data System (ADS)

Fang, Z.; Qiu, Y.; Kuffel, E.

2004-08-01

Non-thermal plasmas under atmospheric pressure are of great interest in material surface processing because of their convenience, effectiveness and low cost. In this paper, the treatment of a glass surface for improving hydrophobicity using a non-thermal plasma generated by a dielectric barrier corona discharge (DBCD) with a needle array-to-plane electrode arrangement in atmospheric air is conducted, and the surface properties of the glass before and after the DBCD treatment are studied using contact angle measurement, surface resistance measurement and the wet flashover voltage test. The effects of the plasma dose (the product of average discharge power and treatment time) of DBCD on the surface modification are studied, and the mechanism of interaction between the plasma and glass surface is discussed. It is found that a layer of hydrophobic coating is formed on the glass surface through DBCD treatment, and the improvement of hydrophobicity depends on the plasma dose of the DBCD. It seems that there is an optimum plasma dose for the surface treatment. The test results of thermal ageing and chemical ageing show that the hydrophobic layer has quite stable characteristics.

Static properties and moisture content properties of polyester fabrics modified by plasma treatment and chemical finishing

NASA Astrophysics Data System (ADS)

Kan, C. W.; Yuen, C. W. M.

2008-01-01

Low temperature plasma treatment has been conducted in textile industry and has some success in the dyeing and finishing processes. In this paper, an attempt was made to apply low temperature plasma treatment to improve the anti-static property of polyester fabric. The polyester fabrics were treated under different conditions using low temperature plasma. An Orthogonal Array Testing Strategy was employed to determine the optimum treatment condition. After low temperature plasma treatment, the polyester fabrics were evaluated with different characterisation methods. Under the observation of scanning electron microscope, the surface structure of low temperature plasma-treated polyester fabric was seriously altered. This provided more capacity for polyester to capture moisture and hence increase the dissipation of static charges. The relationship between moisture content and half-life decay time for static charges was studied and the results showed that the increment of moisture content would result in shortening the time for the dissipation of static charges. Moreover, there was a great improvement in the anti-static property of the low temperature plasma-treated polyester fabric after comparing with that of the polyester fabric treated with commercial anti-static finishing agent.

Physical, chemical, biological, and biotechnological sciences are incomplete without each other

USDA-ARS?s Scientific Manuscript database

Chemical analysis and chromatographic techniques could not separate plasma lipoproteins which are now known as cholesterol- containing, heart-disease related macromolecules in human blood. Scientists at the Lawrence Berkeley Laboratory successfully separated plasma lipoproteins using equilibrium den...

High voltage AC plasma torches with long electric arcs for plasma-chemical applications

NASA Astrophysics Data System (ADS)

Surov, A. V.; Popov, S. D.; Serba, E. O.; Pavlov, A. V.; Nakonechny, Gh V.; Spodobin, V. A.; Nikonov, A. V.; Subbotin, D. I.; Borovskoy, A. M.

2017-04-01

Powerful AC plasma torches are in demand for a number of advanced plasma chemical applications, they can provide high enthalpy of the working gas. IEE RAS specialists have developed a number of models of stationary thermal plasma torches for continuous operation on air with the power from 5 to 500 kW, and on mixture of H2O, CO2 and CH4 up to 150 kW. AC plasma torches were tested on the pilot plasmachemical installations. Powerful AC plasma torch with hollow electrodes and the gas vortex stabilization of arc in cylindrical channels and its operation characteristics are presented. Lifetime of its continuous operation on air is 2000 hours and thermal efficiency is about 92%, the electric arc length between two electrodes of the plasma torch exceeds 2 m.

Impact of plasma treatment under atmospheric pressure on surface chemistry and surface morphology of extruded and injection-molded wood-polymer composites (WPC)

NASA Astrophysics Data System (ADS)

Hünnekens, Benedikt; Avramidis, Georg; Ohms, Gisela; Krause, Andreas; Viöl, Wolfgang; Militz, Holger

2018-05-01

The influence of plasma treatment performed at atmospheric pressure and ambient air as process gas by a dielectric barrier discharge (DBD) on the morphological and chemical surface characteristics of wood-polymer composites (WPC) was investigated by applying several surface-sensitive analytical methods. The surface free energy showed a distinct increase after plasma treatment for all tested materials. The analyzing methods for surface topography-laser scanning microscopy (LSM) and atomic force microscopy (AFM)-revealed a roughening induced by the treatment which is likely due to a degradation of the polymeric surface. This was accompanied by the formation of low-molecular-weight oxidized materials (LMWOMs), appearing as small globular structures. With increasing discharge time, the nodules increase in size and the material degradation proceeds. The surface degradation seems to be more serious for injection-molded samples, whereas the formation of nodules became more apparent and were evenly distributed on extruded surfaces. These phenomena could also be confirmed by scanning electron microscopy (SEM). In addition, differences between extruded and injection-molded surfaces could be observed. Besides the morphological changes, the chemical composition of the substrates' surfaces was affected by the plasma discharge. Infrared spectroscopy (ATR-FTIR) and X-ray photoelectron spectroscopy (XPS) indicated the formation of new oxygen containing polar groups on the modified surfaces.

Plasma based formation and deposition of metal and metal oxide nanoparticles using a gas aggregation source

NASA Astrophysics Data System (ADS)

Polonskyi, Oleksandr; Ahadi, Amir Mohammad; Peter, Tilo; Fujioka, Kenji; Abraham, Jan Willem; Vasiliauskaite, Egle; Hinz, Alexander; Strunskus, Thomas; Wolf, Sebastian; Bonitz, Michael; Kersten, Holger; Faupel, Franz

2018-05-01

Metal clusters and nanoparticles (NPs) have been studied intensively due to their unique chemical, physical, electrical, and optical properties, resulting from their dimensions, which provided host of applications in nanoscience and nanotechnology. Formation of new materials by embedding NPs into various matrices (i.e. formation of nanocomposites) further expands the horizon of possible application of such nanomaterials. In the last few decades, the focus was put on the formation of metallic and metal oxide NPs via a so-called gas aggregation nanoparticle source employing magnetron sputtering (i.e. Haberland concept). In this paper, an overview is given of the recent progress in formation and deposition of NPs by the gas aggregation method. Examples range from noble metals (Ag, Au) through reactive metals (Al, Ti) to Si and the respective oxides. Emphasis is placed on the mechanism of nanoparticle growth and the resulting properties. Moreover, kinetic Monte Carlo simulations were developed to explain the growth mechanism and dynamics of nanoparticle formation depending on the experimental conditions. In addition, the role of trace amounts of reactive gases and of pulsed operation of the plasma on the nucleation process is addressed. Finally, the treatment of the NPs in the plasma environment resulting in nanoparticle charging, morphological and chemical modifications is discussed. Contribution to the Topical Issue "Fundamentals of Complex Plasmas", edited by Jürgen Meichsner, Michael Bonitz, Holger Fehske, Alexander Piel.

Heteroepitaxial Growth of Germanium-on-Silicon Using Ultrahigh-Vacuum Chemical Vapor Deposition with RF Plasma Enhancement

NASA Astrophysics Data System (ADS)

Alharthi, Bader; Grant, Joshua M.; Dou, Wei; Grant, Perry C.; Mosleh, Aboozar; Du, Wei; Mortazavi, Mansour; Li, Baohua; Naseem, Hameed; Yu, Shui-Qing

2018-05-01

Germanium (Ge) films have been grown on silicon (Si) substrate by ultrahigh-vacuum chemical vapor deposition with plasma enhancement (PE). Argon plasma was generated using high-power radiofrequency (50 W) to assist in germane decomposition at low temperature. The growth temperature was varied in the low range of 250°C to 450°C to make this growth process compatible with complementary metal-oxide-semiconductor technology. The material and optical properties of the grown Ge films were investigated. The material quality was determined by Raman and x-ray diffraction techniques, revealing growth of crystalline films in the temperature range of 350°C to 450°C. Photoluminescence spectra revealed improved optical quality at growth temperatures of 400°C and 450°C. Furthermore, material quality study using transmission electron microscopy revealed existence of defects in the Ge layer grown at 400°C. Based on the etch pit density, the average threading dislocation density in the Ge layer obtained at this growth temperature was measured to be 4.5 × 108 cm-2. This result was achieved without any material improvement steps such as use of graded buffer or thermal annealing. Comparison between PE and non-plasma-enhanced growth, in the same machine at otherwise the same growth conditions, indicated increased growth rate and improved material and optical qualities for PE growth.

Simulation and analysis of chemical release in the ionosphere

NASA Astrophysics Data System (ADS)

Gao, Jing-Fan; Guo, Li-Xin; Xu, Zheng-Wen; Zhao, Hai-Sheng; Feng, Jie

2018-05-01

Ionospheric inhomogeneous plasma produced by single point chemical release has simple space-time structure, and cannot impact radio wave frequencies higher than Very High Frequency (VHF) band. In order to produce more complicated ionospheric plasma perturbation structure and trigger instabilities phenomena, multiple-point chemical release scheme is presented in this paper. The effects of chemical release on low latitude ionospheric plasma are estimated by linear instability growth rate theory that high growth rate represents high irregularities, ionospheric scintillation occurrence probability and high scintillation intension in scintillation duration. The amplitude scintillations and the phase scintillations of 150 MHz, 400 MHz, and 1000 MHz are calculated based on the theory of multiple phase screen (MPS), when they propagate through the disturbed area.

Ion energy distributions in bipolar pulsed-dc discharges of methane measured at the biased cathode

NASA Astrophysics Data System (ADS)

Corbella, C.; Rubio-Roy, M.; Bertran, E.; Portal, S.; Pascual, E.; Polo, M. C.; Andújar, J. L.

2011-02-01

The ion fluxes and ion energy distributions (IED) corresponding to discharges in methane (CH4) were measured in time-averaged mode with a compact retarding field energy analyser (RFEA). The RFEA was placed on a biased electrode at room temperature, which was powered by either radiofrequency (13.56 MHz) or asymmetric bipolar pulsed-dc (250 kHz) signals. The shape of the resulting IED showed the relevant populations of ions bombarding the cathode at discharge parameters typical in the material processing technology: working pressures ranging from 1 to 10 Pa and cathode bias voltages between 100 and 200 V. High-energy peaks in the IED were detected at low pressures, whereas low-energy populations became progressively dominant at higher pressures. This effect is attributed to the transition from collisionless to collisional regimes of the cathode sheath as the pressure increases. On the other hand, pulsed-dc plasmas showed broader IED than RF discharges. This fact is connected to the different working frequencies and the intense peak voltages (up to 450 V) driven by the pulsed power supply. This work improves our understanding in plasma processes at the cathode level, which are of crucial importance for the growth and processing of materials requiring controlled ion bombardment. Examples of industrial applications with these requirements are plasma cleaning, ion etching processes during fabrication of microelectronic devices and plasma-enhanced chemical vapour deposition of hard coatings (diamond-like carbon, carbides and nitrides).

One-step preparation of nanostructured martite catalyst and graphite electrode by glow discharge plasma for heterogeneous electro-Fenton like process.

PubMed

Khataee, Alireza; Sajjadi, Saeed; Hasanzadeh, Aliyeh; Vahid, Behrouz; Joo, Sang Woo

2017-09-01

Natural Martite ore particles and graphite were modified by alternating current (AC) glow discharge plasma to form nanostructured catalyst and cathode electrode for using in the heterogeneous-electro Fenton-like (Het-EF-like) process. The performance of the plasma-treated martite (PTM) and graphite electrode (PTGE) was studied for the treatment of paraquat herbicide in a batch system. 85.78% degradation efficiency for 20 mg L -1 paraquat was achieved in the modified process under desired operational conditions (i.e. current intensity of 300 mA, catalyst amount of 1 g L -1 , pH = 6, and background electrolyte (Na 2 SO 4 ) concentration of 0.05 mol L -1 ) which was higher than the 41.03% for the unmodified one after 150 min of treatment. The ecofriendly modification of the martite particles and the graphite electrode, no chemical needed, low leached iron and milder operational pH were the main privileges of plasma utilization. Moreover, the degradation efficiency through the process was not declined after five repeated cycles at the optimized conditions, which proved the stability of the nanostructured PTM and PTGE in the long-term usage. The archived results exhibit this method is the first example of high efficient, cost-effective, and environment-friendly method for generation of nanostructured samples. Copyright © 2017 Elsevier Ltd. All rights reserved.

Taking Venus models to new dimensions.

NASA Astrophysics Data System (ADS)

Murawski, K.

1997-11-01

Space plasma physicists in Poland and Japan have gained new insights into the interaction between the solar wind and Venus. Computer simulations of this 3D global interaction between the solar wind and nonmagnetized bodies have enabled greater understanding of the large-scale processes involved in such phenomena. A model that offers improved understanding of the solar wind interaction with Venus (as well as other nonmagnetized bodies impacted by the solar wind) has been developed. In this model, the interaction of the solar wind with the ionosphere of Venus is studied by calculating numerical solutions of the 3D MHD equations for two-component, chemically reactive plasma. The author describes the innovative model.

Nano powders, components and coatings by plasma technique

DOEpatents

McKechnie, Timothy N [Brownsboro, AL; Antony, Leo V. M. [Huntsville, AL; O'Dell, Scott [Arab, AL; Power, Chris [Guntersville, AL; Tabor, Terry [Huntsville, AL

2009-11-10

Ultra fine and nanometer powders and a method of producing same are provided, preferably refractory metal and ceramic nanopowders. When certain precursors are injected into the plasma flame in a reactor chamber, the materials are heated, melted and vaporized and the chemical reaction is induced in the vapor phase. The vapor phase is quenched rapidly to solid phase to yield the ultra pure, ultra fine and nano product. With this technique, powders have been made 20 nanometers in size in a system capable of a bulk production rate of more than 10 lbs/hr. The process is particularly applicable to tungsten, molybdenum, rhenium, tungsten carbide, molybdenum carbide and other related materials.

Deposition of hard elastic hydrogenated fullerenelike carbon films

NASA Astrophysics Data System (ADS)

Wang, Zhou; Zhang, Junyan

2011-05-01

Hydrogenated fullerenelike carbon (H-FLC) films, with high hardness of 41.7 ± 1.4 GPa and elastic recovery of ˜75.1%, have been uniformly deposited at low temperature by pulse direct current plasma enhanced chemical vapor deposition (pulse DC PECVD). The superior mechanical properties of the H-FLC films are attributed to the unique curvature and interconnection of graphitic basal planes. We propose the fullerenelike structures are formed in the far nonequilibrium pulse plasma environment and stabilized in the sequential fast quenching process. It is expected that the facile deposition of H-FLC films will promote the large-scale low-temperature preparation of engineering protective films for industrial applications.

Normalization of laser-induced breakdown spectroscopy spectra using a plastic optical fiber light collector and acoustic sensor device.

PubMed

Anabitarte, Francisco; Rodríguez-Cobo, Luis; López-Higuera, José-Miguel; Cobo, Adolfo

2012-12-01

To estimate the acoustic plasma energy in laser-induced breakdown spectroscopy (LIBS) experiments, a light collecting and acoustic sensing device based on a coil of plastic optical fiber (POF) is proposed. The speckle perturbation induced by the plasma acoustic energy was monitored using a CCD camera placed at the end of a coil of multimode POF and processed with an intraimage contrast ratio method. The results were successfully verified with the acoustic energy measured by a reference microphone. The proposed device is useful for normalizing LIBS spectra, enabling a better estimation of the sample's chemical composition.

Nano powders, components and coatings by plasma technique

NASA Technical Reports Server (NTRS)

McKechnie, Timothy N. (Inventor); Antony, Leo V. M. (Inventor); O'Dell, Scott (Inventor); Power, Chris (Inventor); Tabor, Terry (Inventor)

2009-01-01

Ultra fine and nanometer powders and a method of producing same are provided, preferably refractory metal and ceramic nanopowders. When certain precursors are injected into the plasma flame in a reactor chamber, the materials are heated, melted and vaporized and the chemical reaction is induced in the vapor phase. The vapor phase is quenched rapidly to solid phase to yield the ultra pure, ultra fine and nano product. With this technique, powders have been made 20 nanometers in size in a system capable of a bulk production rate of more than 10 lbs/hr. The process is particularly applicable to tungsten, molybdenum, rhenium, tungsten carbide, molybdenum carbide and other related materials.

Diffusion in plasma: The Hall effect, compositional waves, and chemical spots

DOE Office of Scientific and Technical Information (OSTI.GOV)

Urpin, V., E-mail: Vadim.urpin@uv.es

2017-03-15

Diffusion caused by a combined influence of the electric current and Hall effect is considered, and it is argued that such diffusion can form inhomogeneities of a chemical composition in plasma. The considered mechanism can be responsible for the formation of element spots in laboratory and astrophysical plasmas. This current-driven diffusion can be accompanied by propagation of a particular type of waves in which the impurity number density oscillates alone. These compositional waves exist if the magnetic pressure in plasma is much greater than the gas pressure.

Etude fondamentale des mecanismes de gravure par plasma de materiaux de pointe: Application a la fabrication de dispositifs photoniques

NASA Astrophysics Data System (ADS)

Stafford, Luc

Advances in electronics and photonics critically depend upon plasma-based materials processing either for transferring small lithographic patterns into underlying materials (plasma etching) or for the growth of high-quality films. This thesis deals with the etching mechanisms of materials using high-density plasmas. The general objective of this work is to provide an original framework for the plasma-material interaction involved in the etching of advanced materials by putting the emphasis on complex oxides such as SrTiO3, (Ba,Sr)TiO 3 and SrBi2Ta2O9 films. Based on a synthesis of the descriptions proposed by different authors to explain the etching characteristics of simple materials in noble and halogenated plasma mixtures, we propose comprehensive rate models for physical and chemical plasma etching processes. These models have been successfully validated using experimental data published in literature for Si, Pt, W, SiO2 and ZnO. As an example, we have been able to adequately describe the simultaneous dependence of the etch rate on ion and reactive neutral fluxes and on the ion energy. From an exhaustive experimental investigation of the plasma and etching properties, we have also demonstrated that the validity of the proposed models can be extended to complex oxides such as SrTiO3, (Ba,Sr)TiO 3 and SrBi2Ta2O9 films. We also reported for the first time physical aspects involved in plasma etching such as the influence of the film microstructural properties on the sputter-etch rate and the influence of the positive ion composition on the ion-assisted desorption dynamics. Finally, we have used our deep investigation of the etching mechanisms of STO films and the resulting excellent control of the etch rate to fabricate a ridge waveguide for photonic device applications. Keywords: plasma etching, sputtering, adsorption and desorption dynamics, high-density plasmas, plasma diagnostics, advanced materials, photonic applications.

Spectroscopic studies of microwave plasmas containing hexamethyldisiloxane

NASA Astrophysics Data System (ADS)

Nave, A. S. C.; Mitschker, F.; Awakowicz, P.; Röpcke, J.

2016-10-01

Low-pressure microwave discharges containing hexamethyldisiloxane (HMDSO) with admixtures of oxygen and nitrogen, used for the deposition of silicon containing films, have been studied spectroscopically. Optical emission spectroscopy (OES) in the visible spectral range has been combined with infrared laser absorption spectroscopy (IRLAS). The experiments were carried out in order to analyze the dependence of plasma chemical phenomena on power and gas mixture at relatively low pressures, up to 50 Pa, and power values, up to 2 kW. The evolution of the concentration of the methyl radical, CH3, and of seven stable molecules, HMDSO, CH4, C2H2, C2H4, C2H6, CO and CO2, was monitored in the plasma processes by in situ IRLAS using tunable lead salt diode lasers (TDL) and external-cavity quantum cascade lasers (EC-QCL) as radiation sources. To achieve reliable values for the gas temperature inside and outside the plasma bulk as well as for the temperature in the plasma hot and colder zones, which are of great importance for calculation of species concentrations, three different methods based on emission and absorption spectroscopy data of N2, CH3 and CO have been used. In this approach line profile analysis has been combined with spectral simulation methods. The concentrations of the various species, which were found to be in the range between 1011 to 1015 cm-3, are in the focus of interest. The influence of the discharge parameters power, pressure and gas mixture on the molecular concentrations has been studied. To achieve further insight into general plasma chemical aspects the dissociation of the HMDSO precursor gas including its fragmentation and conversion to the reaction products was analyzed in detail.