Plasma surface cleaning using microwave plasmas

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tsai, C.C.; Haselton, H.H.; Nelson, W.D.

1993-11-01

In a microwave electron cyclotron resonance (ECR) plasma source, reactive plasmas of oxygen and its mixture with argon are used for plasma-cleaning experiments. Aluminum test samples (0.95 {times} 1.9 cm) were coated with thin films ({le} 20 {mu}m in thickness) of Shell Vitrea oil and cleaned by using such reactive plasmas. The plasma cleaning was done in various discharge conditions with fixed microwave power, rf power, biased potential, gas pressures (0.5 and 5 mtorr), and operating time up to 35 min. The status of plasma cleaning has been monitored by using mass spectroscopy. Mass loss of the samples after plasmamore » cleaning was measured to estimate cleaning rates. Measured clean rates of low pressure (0.5 mtorr) argon/oxygen plasmas were as high as 2.7 {mu}/min. X-ray photoelectron spectroscopy was used to determine cleanliness of the sample surfaces and confirm the effectiveness of plasma cleaning in achieving atomic levels of surface cleanliness. In this paper, significant results are reported and discussed.« less

Method and apparatus for monitoring plasma processing operations

DOEpatents

Smith, Jr., Michael Lane; Ward, Pamela Denise Peardon; Stevenson, Joel O'Don

2002-01-01

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). Another aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system. A final aspect of the present invention relates to a network a plurality of plasma monitoring systems, including with remote capabilities (i.e., outside of the clean room).

Plasma surface cleaning in a microwave plasma source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tsai, C.C.; Nelson, W.D.; Haselton, H.H.

1994-03-01

A microwave electron cyclotron resonance (ECR) plasma source has been operated to produce reactive plasmas of oxygen and its mixture with argon. Aluminum samples (0.95 cm by 1.9 cm) were coated with thin films (<20 {mu}m in thickness) of Shell Vitrea oil and cleaned by using such reactive plasmas. The plasma cleaning was done in discharge conditions of microwave power up to 1300 W, radio frequency power up to 200 W, biased potential up to 400 V, gas pressures up to 5 mtorr, and operating time up to 35 min. The surface texture of the postcleaned samples has been examinedmore » visually. Mass loss of the samples after plasma cleaning was measured to estimate cleaning rates. Measured clean rates of low-pressure (0.5-mtorr) argon/oxygen plasmas were as high as 2.7 {mu}m/min. X-ray photoelectron spectroscopy (XPS) was used to determine cleanliness of the sample surfaces after plasma cleaning. The XPS study on polished samples confirmed the effectiveness of plasma cleaning in achieving atomic level of surface cleanliness. In this technical memorandum plasma properties, cleaning phenomena, and significant results are reported and discussed.« less

Laboratory demonstration model: Active cleaning technique device. [for removal of contaminants from an optical surface

NASA Technical Reports Server (NTRS)

Shannon, R. L.; Gillette, R. B.

1974-01-01

The technique which utilizes exposure to a plasma to remove contaminants from a surface was incorporated into a laboratory model which demonstrates active cleaning by both plasma cleaning and ion sputtering modes of operation. The development phase is reported and includes discussion of the plasma tube configuration, device design, and performance tests. A general description of the active cleaning device is provided which includes information on the main power/plasma discharge sensors, and the power, gas supply, and ion accelerator systems. Development of the active cleaning species at high vacuum conditions is described and results indicate that plasma cleaning occurs in the region of a visible plume which extends from the end of the plasma tube. Recommendations are made for research to determine the plasma cleaning mechanism and the plasma species responsible for the cleaning, as well limitations on the type of contaminants that can be removed.

Mechanisms for dose retention in conformal arsenic doping using a radial line slot antenna microwave plasma source

NASA Astrophysics Data System (ADS)

Ueda, Hirokazu; Ventzek, Peter L. G.; Oka, Masahiro; Kobayashi, Yuuki; Sugimoto, Yasuhiro

2015-06-01

Topographic structures such as Fin FETs and silicon nanowires for advanced gate fabrication require ultra-shallow high dose infusion of dopants into the silicon subsurface. Plasma doping meets this requirement by supplying a flux of inert ions and dopant radicals to the surface. However, the helium ion bombardment needed to infuse dopants into the fin surface can cause poor dose retention. This is due to the interaction between substrate damage and post doping process wet cleaning solutions required in the front end of line large-scale integration fabrication. We present findings from surface microscopy experiments that reveal the mechanism for dose retention in arsenic doped silicon fin samples using a microwave RLSA™ plasma source. Dilute aqueous hydrofluoric acid (DHF) cleans by themselves are incompatible with plasma doping processes because the films deposited over the dosed silicon and ion bombardment damaged silicon are readily removed. Oxidizing wet cleaning chemistries help retain the dose as silica rich over-layers are not significantly degraded. Furthermore, the dosed retention after a DHF clean following an oxidizing wet clean is unchanged. Still, the initial ion bombardment energy and flux are important. Large ion fluxes at energies below the sputter threshold and above the silicon damage threshold, before the silicon surface is covered by an amorphous mixed phase layer, allow for enhanced uptake of dopant into the silicon. The resulting dopant concentration is beyond the saturation limit of crystalline silicon.

Dry efficient cleaning of poly-methyl-methacrylate residues from graphene with high-density H{sub 2} and H{sub 2}-N{sub 2} plasmas

DOE Office of Scientific and Technical Information (OSTI.GOV)

Cunge, G., E-mail: gilles.cunge@cea.fr; Petit-Etienne, C.; Davydova, A.

Graphene is the first engineering electronic material, which is purely two-dimensional: it consists of two exposed sp{sup 2}-hybridized carbon surfaces and has no bulk. Therefore, surface effects such as contamination by adsorbed polymer residues have a critical influence on its electrical properties and can drastically hamper its widespread use in devices fabrication. These contaminants, originating from mandatory technological processes of graphene synthesis and transfer, also impact fundamental studies of the electronic and structural properties at the atomic scale. Therefore, graphene-based technology and research requires “soft” and selective surface cleaning techniques dedicated to limit or to suppress this surface contamination. Here,more » we show that a high-density H{sub 2} and H{sub 2}-N{sub 2} plasmas can be used to selectively remove polymeric residues from monolayer graphene without any damage on the graphene surface. The efficiency of this dry-cleaning process is evidenced unambiguously by a set of spectroscopic and microscopic methods, providing unprecedented insights on the cleaning mechanisms and highlighting the role of specific poly-methyl-methacrylate residues at the graphene interface. The plasma is shown to perform much better cleaning than solvents and has the advantage to be an industrially mature technology adapted to large area substrates. The process is transferable to other kinds of two-dimensional material and heterostructures.« less

Characterization of Carbon-Contaminated B4C-Coated Optics after Chemically Selective Cleaning with Low-Pressure RF Plasma.

PubMed

Moreno Fernández, H; Rogler, D; Sauthier, G; Thomasset, M; Dietsch, R; Carlino, V; Pellegrin, E

2018-01-22

Boron carbide (B 4 C) is one of the few materials that is expected to be most resilient with respect to the extremely high brilliance of the photon beam generated by free electron lasers (FELs) and is thus of considerable interest for optical applications in this field. However, as in the case of many other optics operated at light source facilities, B 4 C-coated optics are subject to ubiquitous carbon contaminations. Carbon contaminations represent a serious issue for the operation of FEL beamlines due to severe reduction of photon flux, beam coherence, creation of destructive interference, and scattering losses. A variety of B 4 C cleaning technologies were developed at different laboratories with varying success. We present a study regarding the low-pressure RF plasma cleaning of carbon contaminated B 4 C test samples via inductively coupled O 2 /Ar, H 2 /Ar, and pure O 2 RF plasma produced following previous studies using the same ibss GV10x downstream plasma source. Results regarding the chemistry, morphology as well as other aspects of the B 4 C optical coating before and after the plasma cleaning are reported. We conclude that among the above plasma processes only plasma based on pure O 2 feedstock gas exhibits the required chemical selectivity for maintaining the integrity of the B 4 C optical coatings.

Argon-oxygen atmospheric pressure plasma treatment on carbon fiber reinforced polymer for improved bonding

NASA Astrophysics Data System (ADS)

Chartosias, Marios

Acceptance of Carbon Fiber Reinforced Polymer (CFRP) structures requires a robust surface preparation method with improved process controls capable of ensuring high bond quality. Surface preparation in a production clean room environment prior to applying adhesive for bonding would minimize risk of contamination and reduce cost. Plasma treatment is a robust surface preparation process capable of being applied in a production clean room environment with process parameters that are easily controlled and documented. Repeatable and consistent processing is enabled through the development of a process parameter window utilizing techniques such as Design of Experiments (DOE) tailored to specific adhesive and substrate bonding applications. Insight from respective plasma treatment Original Equipment Manufacturers (OEMs) and screening tests determined critical process factors from non-factors and set the associated factor levels prior to execution of the DOE. Results from mode I Double Cantilever Beam (DCB) testing per ASTM D 5528 [1] standard and DOE statistical analysis software are used to produce a regression model and determine appropriate optimum settings for each factor.

40 CFR Table I-16 to Subpart I of... - Default Emission Destruction or Removal Efficiency (DRE) Factors for Electronics Manufacturing

Code of Federal Regulations, 2014 CFR

2014-07-01

... Manufacturing: Plasma Etch/Wafer Clean Process Type: CF4 75 CH3F 97 CHF3 97 CH2F2 97 C2F6 97 C3F8 97 C4F6 97 C4F8 97 C5F8 97 SF6 97 NF3 96 All other carbon-based plasma etch/wafer clean fluorinated GHG 60 Chamber...

Particulate contamination removal from wafers using plasmas and mechanical agitation

DOEpatents

Selwyn, G.S.

1998-12-15

Particulate contamination removal from wafers is disclosed using plasmas and mechanical agitation. The present invention includes the use of plasmas with mechanical agitation for removing particulate matter from the surface of a wafer. The apparatus hereof comprises a mechanical activator, at least one conducting contact pin for transferring the vibration from the activator to the wafer, clamp fingers that maintain the wafer`s position, and means for generating a plasma in the vicinity of the surface of the wafer, all parts of the cleaning apparatus except the mechanical activator and part of the contact pin being contained inside the processing chamber. By exposing a wafer to a plasma and providing motion thereto in a direction perpendicular to its surface, the bonding between the particulate matter and the surface may be overcome. Once free of the wafer surface, the particulates become charged by electrons from the plasma and are drawn into the plasma by attractive forces which keep them from redepositing. The introduction of a flowing gas through the plasma sweeps the particulates away from the wafer and out of the plasma. The entire surface is cleaned during one cleaning step. The use of an rf plasma to accomplish the particulate removal was found to remove more than 90% of the particulates. 4 figs.

Particulate contamination removal from wafers using plasmas and mechanical agitation

DOEpatents

Selwyn, Gary S.

1998-01-01

Particulate contamination removal from wafers using plasmas and mechanical agitation. The present invention includes the use of plasmas with mechanical agitation for removing particulate matter from the surface of a wafer. The apparatus hereof comprises a mechanical activator, at least one conducting contact pin for transferring the vibration from the activator to the wafer, clamp fingers that maintain the wafer's position, and means for generating a plasma in the vicinity of the surface of the wafer, all parts of the cleaning apparatus except the mechanical activator and part of the contact pin being contained inside the processing chamber. By exposing a wafer to a plasma and providing motion thereto in a direction perpendicular to its surface, the bonding between the particulate matter and the surface may be overcome. Once free of the wafer surface, the particulates become charged by electrons from the plasma and are drawn into the plasma by attractive forces which keep them from redepositing. The introduction of a flowing gas through the plasma sweeps the particulates away from the wafer and out of the plasma. The entire surface is cleaned during one cleaning step. The use of an rf plasma to accomplish the particulate removal was found to remove more than 90% of the particulates.

Alternative, Green Processes for the Precision Cleaning of Aerospace Hardware

NASA Technical Reports Server (NTRS)

Maloney, Phillip R.; Grandelli, Heather Eilenfield; Devor, Robert; Hintze, Paul E.; Loftin, Kathleen B.; Tomlin, Douglas J.

2014-01-01

Precision cleaning is necessary to ensure the proper functioning of aerospace hardware, particularly those systems that come in contact with liquid oxygen or hypergolic fuels. Components that have not been cleaned to the appropriate levels may experience problems ranging from impaired performance to catastrophic failure. Traditionally, this has been achieved using various halogenated solvents. However, as information on the toxicological and/or environmental impacts of each came to light, they were subsequently regulated out of use. The solvent currently used in Kennedy Space Center (KSC) precision cleaning operations is Vertrel MCA. Environmental sampling at KSC indicates that continued use of this or similar solvents may lead to high remediation costs that must be borne by the Program for years to come. In response to this problem, the Green Solvents Project seeks to develop state-of-the-art, green technologies designed to meet KSCs precision cleaning needs.Initially, 23 solvents were identified as potential replacements for the current Vertrel MCA-based process. Highly halogenated solvents were deliberately omitted since historical precedents indicate that as the long-term consequences of these solvents become known, they will eventually be regulated out of practical use, often with significant financial burdens for the user. Three solvent-less cleaning processes (plasma, supercritical carbon dioxide, and carbon dioxide snow) were also chosen since they produce essentially no waste stream. Next, experimental and analytical procedures were developed to compare the relative effectiveness of these solvents and technologies to the current KSC standard of Vertrel MCA. Individually numbered Swagelok fittings were used to represent the hardware in the cleaning process. First, the fittings were cleaned using Vertrel MCA in order to determine their true cleaned mass. Next, the fittings were dipped into stock solutions of five commonly encountered contaminants and were weighed again showing typical contaminant deposition levels of approximately 0.00300g per part. They were then cleaned by the solvent or process being tested and then weighed a third time which allowed for the calculation of the cleaning efficiency of the test solvent or process.Based on preliminary experiments, five solvents (ethanol, isopropanol, acetone, ethyl acetate, and tert-butyl acetate) were down selected for further testing. When coupled with ultrasonic agitation, these solvents removed hydrocarbon contaminants as well as Vertrel MCA and showed improved removal of perfluorinated greases. Supercritical carbon dioxide did an excellent job dissolving each of the five contaminants but did a poor job of removing Teflon particles found in the perfluorinated greases. Plasma cleaning efficiency was found to be dependent on which supply gas was used, exposure time, and gas pressure. Under optimized conditions it was found that breathing air, energized to the plasma phase, was able to remove nearly 100% of the contamination.These findings indicate that alternative cleaning methods are indeed able to achieve precision levels of cleanliness. Currently, our team is working with a commercial cleaning company to get independent verification of our results. We are also evaluating the technical and financial aspects of scaling these processes to a size capable of supporting the future cleaning needs of KSC.

Surface Structure and Surface Electronic States Related to Plasma Cleaning of Silicon and Germanium

NASA Astrophysics Data System (ADS)

Cho, Jaewon

This thesis discusses the surface structure and the surface electronic states of Si and Ge(100) surfaces as well as the effects of oxidation process on the silicon oxide/Si(100) interface structure. The H-plasma exposure was performed in situ at low temperatures. The active species, produced in the H-plasma by the rf-excitation of H_2 gas, not only remove microcontaminants such as oxygen and carbon from the surface, but also passivate the surface with atomic hydrogen by satisfying the dangling bonds of the surface atoms. The surfaces were characterized by Angle Resolved UV-Photoemission Spectroscopy (ARUPS) and Low Energy Electron Diffraction (LEED). In the case of Si(100), H-plasma exposure produced ordered H-terminated crystallographic structures with either a 2 x 1 or 1 x 1 LEED pattern. The hydride phases, found on the surfaces of the cleaned Si(100), were shown to depend on the temperature of the surface during H-plasma cleaning. The electronic states for the monohydride and dihydride phases were identified by ARUPS. When the plasma cleaned surface was annealed, the phase transition from the dihydride to monohydride was observed. The monohydride Si-H surface bond was stable up to 460^circC, and the dangling bond surface states were identified after annealing at 500^circC which was accompanied by the spectral shift. The H-terminated surface were characterized to have a flat band structure. For the Ge(100) surface, an ordered 2 x 1 monohydride phase was obtained from the surface cleaned at 180 ^circC. After plasma exposure at <=170^circC a 1 x 1 surface was observed, but the ARUPS indicated that the surface was predominantly composed of disordered monohydride structures. After annealing above the H-dissociation temperatures, the shift in the spectrum was shown to occur with the dangling bond surface states. The H-terminated surfaces were identified to be unpinned. The interface structure of silicon oxide/Si(100) was studied using ARUPS. Spectral shifts were observed, which were dependent on the processes of surface preparation and oxidation. The shift was characterized in association with the band bending. The origins of the spectral shifts were discussed, including defects at interface and H-passivation in Si. The interface structure is considered to be dependent on the surface preparation and oxidation process.

Environmentally Sound Processing Technology: JANNAF Safety and Environmental Protection Subcommittee and Propellant Development and Characterization Subcommittee Joint Workshop

NASA Technical Reports Server (NTRS)

Pickett, Lorri A. (Editor)

1995-01-01

Topics covered include: Risk assessment of hazardous materials, Automated systems for pollution prevention and hazardous materials elimination, Study design for the toxicity evaluation of ammonium perchlorate, Plasma sprayed bondable stainless surface coatings, Development of CFC-free cleaning processes, New fluorinated solvent alternatives to ozone depleting solvents, Cleaning with highly fluorinated liquids, Biotreatment of propyleneglycol nitrate by anoxic denitrification, Treatment of hazardous waste with white rot fungus, Hydrothermal oxidation as an environmentally benign treatment technology, Treatment of solid propellant manufacturing wastes by base hydrolysis, Design considerations for cleaning using supercritical fluid technology, and Centrifugal shear carbon dioxide cleaning.

Low-pressure RF remote plasma cleaning of carbon-contaminated B4C-coated optics

NASA Astrophysics Data System (ADS)

Moreno Fernández, H.; Thomasset, M.; Sauthier, G.; Rogler, D.; Dietsch, R.; Barrett, R.; Carlino, V.; Pellegrin, E.

2017-05-01

Boron carbide (B4C) - due to its exceptional mechanical properties - is one of the few existing materials that can withstand the extremely high brilliance of the photon beam from free electron lasers (FELs) and is thus of considerable interest for optical applications in this field. However, as in the case of many other optics operated at modern accelerator-, plasma-, or laser-based light source facilities, B4C-coated optics are subject to ubiquitous carbon contaminations. These contaminations - that are presumably produced via cracking of CHx and CO2 molecules by photoelectrons emitted from the optical components - represent a serious issue for the operation of the pertinent high performance beamlines due to a severe reduction of photon flux and beam coherence, not necessarily restricted to the photon energy range of the carbon K-edge. Thus, a variety of B4C cleaning technologies have been developed at different laboratories with varying success [1]. Here, we present a study regarding the low-pressure RF plasma cleaning of a series of carbon-contaminated B4C test samples via an inductively coupled O2/Ar and Ar/H2 remote RF plasma produced using the IBSS GV10x plasma source following previous studies using the same RF plasma source [2, 3]. Results regarding the chemistry, morphology as well as other aspects of the B4C optical coatings and surfaces before and after the plasma cleaning process are reported.

Comparative study between chemical and atmospheric pressure plasma jet cleaning on glass substrate

NASA Astrophysics Data System (ADS)

Elfa, Rizan Rizon; Ahmad, Mohd Khairul; Fhong, Soon Chin; Sahdan, Mohd Zainizan; Nayan, Nafarizal

2017-01-01

The atmospheric pressure plasma jet with low frequency and argon as working gas is presented in this paper to demonstrate its application for glass substrate clean and modification. The glass substrate clean by atmospheric pressure plasma jet is an efficient method to replace other substrate clean method. A comparative analysis is done in this paper between substrate cleaned by chemical and plasma treatment methods. Water contact angle reading is taken for a different method of substrate clean and period of treatment. Under the plasma treatment, the sample shows low surface adhesion due to having the surface property of super hydrophilic surface 7.26°. This comparative analysis is necessary in the industrial application for cost production due to sufficient time and method of substrate clean.

Plasma separation

NASA Technical Reports Server (NTRS)

Steurer, Wolfgang

1992-01-01

This process employs a thermal plasma for the separation and production of oxygen and metals. It is a continuous process that requires no consumables and relies entirely on space resources. The almost complete absence of waste renders it relatively clean. It can be turned on or off without any undesirable side effects or residues. The prime disadvantage is its high power consumption.

Photoresist removal using gaseous sulfur trioxide cleaning technology

NASA Astrophysics Data System (ADS)

Del Puppo, Helene; Bocian, Paul B.; Waleh, Ahmad

1999-06-01

A novel cleaning method for removing photoresists and organic polymers from semiconductor wafers is described. This non-plasma method uses anhydrous sulfur trioxide gas in a two-step process, during which, the substrate is first exposed to SO3 vapor at relatively low temperatures and then is rinsed with de-ionized water. The process is radically different from conventional plasma-ashing methods in that the photoresist is not etched or removed during the exposure to SO3. Rather, the removal of the modified photoresist takes place during the subsequent DI-water rinse step. The SO3 process completely removes photoresist and polymer residues in many post-etch applications. Additional advantages of the process are absence of halogen gases and elimination of the need for other solvents and wet chemicals. The process also enjoys a very low cost of ownership and has minimal environmental impact. The SEM and SIMS surface analysis results are presented to show the effectiveness of gaseous SO3 process after polysilicon, metal an oxide etch applications. The effects of both chlorine- and fluorine-based plasma chemistries on resist removal are described.

Atmospheric plasma generation for LCD panel cleaning

NASA Astrophysics Data System (ADS)

Kim, Gyu-Sik; Won, Chung-Yuen; Choi, Ju-Yeop; Yim, C. H.

2007-12-01

UV lamp systems have been used for cleaning of display panels of TFT LCD or Plasma Display Panel (PDP). However, the needs for high efficient cleaning and low cost made high voltage plasma cleaning techniques to be developed and to be improved. Dielectric-barrier discharges (DBDs), also referred to as barrier discharges or silent discharges have for a long time been exclusively related to ozone generation. In this paper, a 6kW high voltage plasma power supply system was developed for LCD cleaning. The -phase input voltage is rectified and then inverter system is used to make a high frequency pulse train, which is rectified after passing through a high-power transformer. Finally, bi-directional high voltage pulse switching circuits are used to generate the high voltage plasma. Some experimental results showed the usefulness of atmospheric plasma for LCD panel cleaning.

Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge

DOEpatents

Selwyn, Gary S.; Henins, Ivars; Park, Jaeyoung; Herrmann, Hans W.

2006-04-11

Apparatus for the processing of materials involving placing a material either placed between an radio-frequency electrode and a ground electrode, or which is itself one of the electrodes. This is done in atmospheric pressure conditions. The apparatus effectively etches or cleans substrates, such as silicon wafers, or provides cleaning of spools and drums, and uses a gas containing an inert gas and a chemically reactive gas.

Plasma ignition and tuning in different cells of a 1.3 GHz nine-cell superconducting radio frequency cavity: Proof of principle

NASA Astrophysics Data System (ADS)

Tyagi, P. V.; Moss, Andrew; Goudket, Philippe; Pattalwar, Shrikant; Herbert, Joe; Valizadeh, Reza; McIntosh, Peter

2018-06-01

Field emission is one of the critical issues in the superconducting radio frequency (SRF) cavities and can degrade their accelerating gradient during operation. The contamination present at top surface of the SRF cavity is one of the foremost reasons for field emission. Plasma based surface processing can be a viable option to eliminate such surface contaminants and enhance performance of the SRF cavity especially for in-situ applications. These days, 1.3 GHz nine-cell SRF cavity has become baseline standard for many particle accelerators, it is of interest to develop plasma cleaning technique for such SRF cavities. In the development of the plasma processing technique for SRF cavities, the most challenging task is to ignite and tune the plasma in different cells of the SRF cavity. At Daresbury laboratory, UK, we have successfully achieved plasma ignition in different cells of a 1.3 GHz nine-cell SRF cavity. The plasma ignition in different cells of the cavity was accomplished at room temperature towards room temperature plasma cleaning of the SRF cavity surface. Here, we report the successful demonstration of the plasma ignition in different cells of a 1.3 GHz nine-cell SRF cavity.

Avalanche boron fusion by laser picosecond block ignition with magnetic trapping for clean and economic reactor

DOE PAGES

Hora, H.; Korn, G.; Eliezer, S.; ...

2016-10-11

Measured highly elevated gains of proton–boron (HB11) fusion (Picciottoet al., Phys. Rev. X4, 031030 (2014)) confirmed the exceptional avalanche reaction process (Lalousiset al., Laser Part. Beams 32, 409 (2014); Horaet al., Laser Part. Beams33, 607 (2015)) for the combination of the non-thermal block ignition using ultrahigh intensity laser pulses of picoseconds duration. The ultrahigh accelerationabovemore » $$10^{20}~\\text{cm}~\\text{s}^{-2}$$ for plasma blocks was theoretically and numerically predicted since 1978 (Hora,Physics of Laser Driven Plasmas(Wiley, 1981), pp. 178 and 179) and measured (Sauerbrey, Phys. Plasmas3, 4712 (1996)) in exact agreement (Horaet al., Phys. Plasmas14, 072701 (2007)) when the dominating force was overcoming thermal processes. This is based on Maxwell’s stress tensor by the dielectric properties of plasma leading to the nonlinear (ponderomotive) force $$f_{\\text{NL}}$$ resulting in ultra-fast expanding plasma blocks by a dielectric explosion. Combining this with measured ultrahigh magnetic fields and the avalanche process opens an option for an environmentally absolute clean and economic boron fusion power reactor. Finally, this is supported also by other experiments with very high HB11 reactions under different conditions (Labauneet al., Nature Commun.4, 2506 (2013)).« less

Plasmas for environmental issues: from hydrogen production to 2D materials assembly

NASA Astrophysics Data System (ADS)

Tatarova, E.; Bundaleska, N.; Sarrette, J. Ph; Ferreira, C. M.

2014-12-01

It is well recognized at present that the unique, high energy density plasma environment provides suitable conditions to dissociate/atomize molecules in remediation systems, to convert waste and biomass into sustainable energy sources, to purify water, to assemble nanostructures, etc. The remarkable plasma potential is based on its ability to supply simultaneously high fluxes of charged particles, chemically active molecules, radicals (e.g. O, H, OH), heat, highly energetic photons (UV and extreme UV radiation), and strong electric fields in intrinsic sheath domains. Due to this complexity, low-temperature plasma science and engineering is a huge, highly interdisciplinary field that spans many research disciplines and applications across many areas of our daily life and industrial activities. For this reason, this review deals only with some selected aspects of low-temperature plasma applications for a clean and sustainable environment. It is not intended to be a comprehensive survey, but just to highlight some important works and achievements in specific areas. The selected issues demonstrate the diversity of plasma-based applications associated with clean and sustainable ambiance and also show the unity of the underlying science. Fundamental plasma phenomena/processes/features are the common fibers that pass across all these areas and unify all these applications. Browsing through different topics, we try to emphasize these phenomena/processes/features and their uniqueness in an attempt to build a general overview. The presented survey of recently published works demonstrates that plasma processes show a significant potential as a solution for waste/biomass-to-energy recovery problems. The reforming technologies based on non-thermal plasma treatment of hydrocarbons show promising prospects for the production of hydrogen as a future clean energy carrier. It is also shown that plasmas can provide numerous agents that influence biological activity. The simultaneous generation in water discharges of intense UV radiation, shock waves and active radicals (OH, O, H2O2, etc), which are all effective agents against many biological pathogens and harmful chemicals, make these discharges suitable for decontamination, sterilization and purification processes. Moreover, plasmas appear as invaluable tools for the synthesis and engineering of new nanomaterials and in particular 2D materials. A brief overview on plasma-synthesized carbon nanostructures shows the high potential of such materials for energy conversion and storage applications.

Plasma Cleaning

NASA Technical Reports Server (NTRS)

Hintze, Paul E.

2016-01-01

NASA's Kennedy Space Center has developed two solvent-free precision cleaning techniques: plasma cleaning and supercritical carbon dioxide (SCCO2), that has equal performance, cost parity, and no environmental liability, as compared to existing solvent cleaning methods.

A cost- and time-saving strategy of spraying TiO2 self-cleaning coatings in tubular substrates by air cold plasma

NASA Astrophysics Data System (ADS)

Zhang, Lujie; Yu, Shuang; Wang, Kaile; Zhang, Jue; Fang, Jing

2017-11-01

In this study, using an atmospheric pressure air plasma jet generated by a dielectric barrier structure with hollow electrodes (HEDBS), we developed an ultrafast process for spraying TiO2 self-cleaning films inside tubular substrates. Importantly, SEM images showed that the TiO2 particles were dispersed evenly in the tubular substrates. Furthermore, Raman and XRD pattern indicated the anatase structure of the HEDBS-spayed TiO2 coating after heating at 270 °C. Further results of the self cleaning test suggested that the proposed cost- and time-saving HEDBS approach with air working gas could provide a feasible way for synthesizing thin TiO2 nanofilms.

Active cleaning technique for removing contamination from optical surfaces in space

NASA Technical Reports Server (NTRS)

Shannon, R. L.; Gillette, R. B.; Cruz, G. A.

1973-01-01

An active cleaning technique for removing contaminants from optical surfaces in space was investigated with emphasis on the feasibility of using plasma exposure as a means of in-situ cleaning. The major work accomplished includes: (1) development of an in-situ reflectometer for use in conjunction with the contaminant film deposition/cleaning facility; (2) completion of Apollo Telescope Mount (ATM) filter treatment experiments to assess the effects of plasma exposure on the UV transmittance; (3) attempts to correlate the atomic oxygen flux with cleaning rate; (4) completion of in-situ butadien contamination/plasma cleaning/UV reflectance measurement experiments; (5) carbon cleaning experiments using various gases; (6) completion of silicone contamination/cleaning experiments; and (7) experiments conducted at low chamber pressures to determine cleaning rate distribution and contamination of surfaces adjacent to those being cleaned.

Quantitative cleaning characterization of a lithium-fluoride ion diode

DOE Office of Scientific and Technical Information (OSTI.GOV)

Menge, P.R.; Cuneo, M.E.

An ion source cleaning testbed was created to test plasma-cleaning techniques, and to provide quantitative data on plasma-cleaning protocols prior to implementation on the SABRE accelerator. The testbed was designed to resolve issues regarding the quantity of contaminants absorbed by the anode source (LiF), and the best cleaning methodology. A test chamber was devised containing a duplicate of the SABRE diode. Radio-frequency (RF) power was fed to the anode, which was isolated from ground and thus served as the plasma discharge electrode. RF plasma discharges in 1--3 mtorr of Ar with 10% O{sub 2} were found to provide the bestmore » cleaning of the LiF surface. X-ray photoelectron spectroscopy (XPS) showed that the LiF could accrue dozens of monolayers of carbon just by sitting in a 2 {times} 10{sup {minus}5} vacuum for 24 h. Tests of various discharge cleaning protocols indicated that 15 min of an Ar/O{sub 2} discharge was sufficient to reduce this initial 13--45 monolayers of carbon impurities to 2--4 monolayers. Rapid recontamination of the LiF was also observed. Up to ten monolayers of carbon returned in 2 min after termination of the plasma discharge and subsequent pumping back to the 10{sup {minus}5} torr range. Heating of the LiF also was found to provide anode cleaning. Application of heating combined with plasma cleaning provided the highest cleaning rates.« less

Simultaneous specimen and stage cleaning device for analytical electron microscope

DOEpatents

Zaluzec, Nestor J.

1996-01-01

An improved method and apparatus are provided for cleaning both a specimen stage, a specimen and an interior of an analytical electron microscope (AEM). The apparatus for cleaning a specimen stage and specimen comprising a plasma chamber for containing a gas plasma and an air lock coupled to the plasma chamber for permitting passage of the specimen stage and specimen into the plasma chamber and maintaining an airtight chamber. The specimen stage and specimen are subjected to a reactive plasma gas that is either DC or RF excited. The apparatus can be mounted on the analytical electron microscope (AEM) for cleaning the interior of the microscope.

Delta-Doping at Wafer Level for High Throughput, High Yield Fabrication of Silicon Imaging Arrays

NASA Technical Reports Server (NTRS)

Hoenk, Michael E. (Inventor); Nikzad, Shoulch (Inventor); Jones, Todd J. (Inventor); Greer, Frank (Inventor); Carver, Alexander G. (Inventor)

2014-01-01

Systems and methods for producing high quantum efficiency silicon devices. A silicon MBE has a preparation chamber that provides for cleaning silicon surfaces using an oxygen plasma to remove impurities and a gaseous (dry) NH3 + NF3 room temperature oxide removal process that leaves the silicon surface hydrogen terminated. Silicon wafers up to 8 inches in diameter have devices that can be fabricated using the cleaning procedures and MBE processing, including delta doping.

Soft tissue cell adhesion to titanium abutments after different cleaning procedures: Preliminary results of a randomized clinical trial

PubMed Central

Canullo, Luigi; Peñarrocha-Oltra, David; Marchionni, Silvia; Bagán, Leticia; Micarelli, Costanza

2014-01-01

Objectives: A randomized controlled trial was performed to assess soft tissue cell adhesion to implant titanium abutments subjected to different cleaning procedures and test if plasma cleaning can enhance cell adhesion at an early healing time. Study Design: Eighteen patients with osseointegrated and submerged implants were included. Before re-opening, 18 abutments were divided in 3 groups corresponding to different clinical conditions with different cleaning processes: no treatment (G1), laboratory customization and cleaning by steam (G2), cleaning by plasma of Argon (G3). Abutments were removed after 1 week and scanning electron microscopy was used to analyze cell adhesion to the abutment surface quantitatively (percentage of area occupied by cells) and qualitatively (aspect of adhered cells and presence of contaminants). Results: Mean percentages of area occupied by cells were 17.6 ± 22.7%, 16.5 ± 12.9% and 46.3 ± 27.9% for G1, G2 and G3 respectively. Differences were statistically significant between G1 and G3 (p=0.030), close to significance between G2 and G3 (p=0.056), and non-significant between G1 and G2 (p=0.530). The proportion of samples presenting adhered cells was homogeneous among the 3 groups (p-valor = 1.000). In all cases cells presented a flattened aspect; in 2 cases cells were less efficiently adhered and in 1 case cells presented filipodia. Three cases showed contamination with cocobacteria. Conclusions: Within the limits of the present study, plasma of Argon may enhance cell adhesion to titanium abutments, even at the early stage of soft tissue healing. Further studies with greater samples are necessary to confirm these findings. Key words:Connective tissue, dental abutments, randomized controlled trial, clinical research, glow discharged abutment, plasma cleaning. PMID:24121917

Plasma discharge self-cleaning filtration system

DOEpatents

Cho, Young I.; Fridman, Alexander; Gutsol, Alexander F.; Yang, Yong

2014-07-22

The present invention is directed to a novel method for cleaning a filter surface using a plasma discharge self-cleaning filtration system. The method involves utilizing plasma discharges to induce short electric pulses of nanoseconds duration at high voltages. These electrical pulses generate strong Shockwaves that disintegrate and dislodge particulate matter located on the surface of the filter.

IV INTERNATIONAL CONFERENCE ON ATOM AND MOLECULAR PULSED LASERS (AMPL'99): Surface oxide removal by a XeCl laser for decontamination

NASA Astrophysics Data System (ADS)

Sentis, M. L.; Delaporte, Ph; Marine, W.; Uteza, O.

2000-06-01

The laser ablation performed with an automated excimer XeCl laser unit is used for large surface cleaning. The study focuses on metal surfaces that are oxidised and are representative of contaminated surfaces with radionuclides in a context of nuclear power plant maintenance. The unit contains an XeCl laser, the beam delivery system, the particle collection cell, and the system for real-time control of cleaning processes. The interaction of laser radiation with a surface is considered, in particular, the surface damage caused by cleaning radiation. The beam delivery system consists of an optical fibre bundle of 5 m long and allows delivering 150 W at 308 nm for laser surface cleaning. The cleaning process is controlled by analysing in real time the plasma electric field evolution. The system permits the cleaning of 2 to 6 m2 h-1 of oxides with only slight substrate modifications.

Modeling Cl2/O2/Ar inductively coupled plasmas used for silicon etching: effects of SiO2 chamber wall coating

NASA Astrophysics Data System (ADS)

Tinck, S.; Boullart, W.; Bogaerts, A.

2011-08-01

In this paper, simulations are performed to gain a better insight into the properties of a Cl2/Ar plasma, with and without O2, during plasma etching of Si. Both plasma and surface properties are calculated in a self-consistent manner. Special attention is paid to the behavior of etch products coming from the wafer or the walls, and how the chamber walls can affect the plasma and the resulting etch process. Two modeling cases are considered. In the first case, the reactor walls are defined as clean (Al2O3), whereas in the second case a SiO2 coating is introduced on the reactor walls before the etching process, so that oxygen will be sputtered from the walls and introduced into the plasma. For this reason, a detailed reaction set is presented for a Cl2/O2/Ar plasma containing etched species, as well as an extensive reaction set for surface processes, including physical and chemical sputtering, chemical etching and deposition processes. Density and flux profiles of various species are presented for a better understanding of the bulk plasma during the etching process. Detailed information is also given on the composition of the surfaces at various locations of the reactor, on the etch products in the plasma and on the surface loss probabilities of the plasma species at the walls, with different compositions. It is found that in the clean chamber, walls are mostly chlorinated (Al2Cl3), with a thin layer of etch products residing on the wall. In the coated chamber, an oxy-chloride layer is grown on the walls for a few nanometers during the etching process. The Cl atom wall loss probability is found to decrease significantly in the coated chamber, hence increasing the etch rate. SiCl2, SiCl4 and SiCl3 are found to be the main etch products in the plasma, with the fraction of SiCl2 being always slightly higher. The simulation results compare well with experimental data available from the literature.

Plasma cleaning of ITER first mirrors

NASA Astrophysics Data System (ADS)

Moser, L.; Marot, L.; Steiner, R.; Reichle, R.; Leipold, F.; Vorpahl, C.; Le Guern, F.; Walach, U.; Alberti, S.; Furno, I.; Yan, R.; Peng, J.; Ben Yaala, M.; Meyer, E.

2017-12-01

Nuclear fusion is an extremely attractive option for future generations to compete with the strong increase in energy consumption. Proper control of the fusion plasma is mandatory to reach the ambitious objectives set while preserving the machine’s integrity, which requests a large number of plasma diagnostic systems. Due to the large neutron flux expected in the International Thermonuclear Experimental Reactor (ITER), regular windows or fibre optics are unusable and were replaced by so-called metallic first mirrors (FMs) embedded in the neutron shielding, forming an optical labyrinth. Materials eroded from the first wall reactor through physical or chemical sputtering will migrate and will be deposited onto mirrors. Mirrors subject to net deposition will suffer from reflectivity losses due to the deposition of impurities. Cleaning systems of metallic FMs are required in more than 20 optical diagnostic systems in ITER. Plasma cleaning using radio frequency (RF) generated plasmas is currently being considered the most promising in situ cleaning technique. An update of recent results obtained with this technique will be presented. These include the demonstration of cleaning of several deposit types (beryllium, tungsten and beryllium proxy, i.e. aluminium) at 13.56 or 60 MHz as well as large scale cleaning (mirror size: 200 × 300 mm2). Tests under a strong magnetic field up to 3.5 T in laboratory and first experiments of RF plasma cleaning in EAST tokamak will also be discussed. A specific focus will be given on repetitive cleaning experiments performed on several FM material candidates.

Hot spots and dark current in advanced plasma wakefield accelerators

DOE PAGES

Manahan, G. G.; Deng, A.; Karger, O.; ...

2016-01-29

Dark current can spoil witness bunch beam quality and acceleration efficiency in particle beam-driven plasma wakefield accelerators. In advanced schemes, hot spots generated by the drive beam or the wakefield can release electrons from higher ionization threshold levels in the plasma media. Likewise, these electrons may be trapped inside the plasma wake and will then accumulate dark current, which is generally detrimental for a clear and unspoiled plasma acceleration process. The strategies for generating clean and robust, dark current free plasma wake cavities are devised and analyzed, and crucial aspects for experimental realization of such optimized scenarios are discussed.

Investigation of photolithography process on SPOs for the Athena mission

NASA Astrophysics Data System (ADS)

Massahi, S.; Girou, D. A.; Ferreira, D. D. M.; Christensen, F. E.; Jakobsen, A. C.; Shortt, B.; Collon, M.; Landgraf, B.

2015-09-01

As part of the ongoing effort to optimize the throughput of the Athena optics we have produced mirrors with a state-of-the-art cleaning process. We report on the studies related to the importance of the photolithographic process. Pre-coating characterization of the mirrors has shown and still shows photoresist remnants on the SiO2- rib bonding zones, which influences the quality of the metallic coating and ultimately the mirror performance. The size of the photoresist remnants is on the order of 10 nm which is about half the thickness of final metallic coating. An improved photoresist process has been developed including cleaning with O2 plasma in order to remove the remaining photoresist remnants prior to coating. Surface roughness results indicate that the SiO2-rib bonding zones are as clean as before the photolithography process is performed.

Towards defect free EUVL reticles: carbon and particle removal by single dry cleaning process and pattern repair by HIM

NASA Astrophysics Data System (ADS)

Koster, N. B.; Molkenboer, F. T.; van Veldhoven, E.; Oostrom, S.

2011-04-01

We report on our findings on EUVL reticle contamination removal, inspection and repair. We show that carbon contamination can be removed without damage to the reticle by our plasma process. Also organic particles, simulated by PSL spheres, can be removed from both the surface of the absorber as well as from the bottom of the trenches. The particles shrink in size during the plasma treatment until they are vanished. The determination of the necessary cleaning time for PSL spheres was conducted on Ru coated samples and the final experiment was performed on our dummy reticle. Finally we show that the Helium Ion Microscope in combination with a Gas Injection System is capable of depositing additional lines and squares on the reticle with sufficient resolution for pattern repair.

Plasma cleaning of ITER edge Thomson scattering mock-up mirror in the EAST tokamak

NASA Astrophysics Data System (ADS)

Yan, Rong; Moser, Lucas; Wang, Baoguo; Peng, Jiao; Vorpahl, Christian; Leipold, Frank; Reichle, Roger; Ding, Rui; Chen, Junling; Mu, Lei; Steiner, Roland; Meyer, Ernst; Zhao, Mingzhong; Wu, Jinhua; Marot, Laurent

2018-02-01

First mirrors are the key element of all optical and laser diagnostics in ITER. Facing the plasma directly, the surface of the first mirrors could be sputtered by energetic particles or deposited with contaminants eroded from the first wall (tungsten and beryllium), which would result in the degradation of the reflectivity. The impurity deposits emphasize the necessity of the first mirror in situ cleaning for ITER. The mock-up first mirror system for ITER edge Thomson scattering diagnostics has been cleaned in EAST for the first time in a tokamak using radio frequency capacitively coupled plasma. The cleaning properties, namely the removal of contaminants and homogeneity of cleaning were investigated with molybdenum mirror insets (25 mm diameter) located at five positions over the mock-up plate (center to edge) on which 10 nm of aluminum oxide, used as beryllium proxy, were deposited. The cleaning efficiency was evaluated using energy dispersive x-ray spectroscopy, reflectivity measurements and x-ray photoelectron spectroscopy. Using argon or neon plasma without magnetic field in the laboratory and with a 1.7 T magnetic field in the EAST tokamak, the aluminum oxide films were homogeneously removed. The full recovery of the mirrors’ reflectivity was attained after cleaning in EAST with the magnetic field, and the cleaning efficiency was about 40 times higher than that without the magnetic field. All these results are promising for the plasma cleaning baseline scenario of ITER.

Surface oxidation of GaN(0001): Nitrogen plasma-assisted cleaning for ultrahigh vacuum applications

DOE Office of Scientific and Technical Information (OSTI.GOV)

Gangopadhyay, Subhashis; Schmidt, Thomas, E-mail: tschmidt@ifp.uni-bremen.de; Kruse, Carsten

The cleaning of metal-organic vapor-phase epitaxial GaN(0001) template layers grown on sapphire has been investigated. Different procedures, performed under ultrahigh vacuum conditions, including degassing and exposure to active nitrogen from a radio frequency nitrogen plasma source have been compared. For this purpose, x-ray photoelectron spectroscopy, reflection high-energy electron diffraction, and scanning tunneling microscopy have been employed in order to assess chemical as well as structural and morphological surface properties. Initial degassing at 600 °C under ultrahigh vacuum conditions only partially eliminates the surface contaminants. In contrast to plasma assisted nitrogen cleaning at temperatures as low as 300 °C, active-nitrogen exposure at temperaturesmore » as high as 700 °C removes the majority of oxide species from the surface. However, extended high-temperature active-nitrogen cleaning leads to severe surface roughening. Optimum results regarding both the removal of surface oxides as well as the surface structural and morphological quality have been achieved for a combination of initial low-temperature plasma-assisted cleaning, followed by a rapid nitrogen plasma-assisted cleaning at high temperature.« less

Towards plasma cleaning of ITER first mirrors

NASA Astrophysics Data System (ADS)

Moser, L.; Marot, L.; Eren, B.; Steiner, R.; Mathys, D.; Leipold, F.; Reichle, R.; Meyer, E.

2015-06-01

To avoid reflectivity losses in ITER's optical diagnostic systems, on-site cleaning of metallic first mirrors via plasma sputtering is foreseen to remove deposit build-ups migrating from the main wall. In this work, the influence of aluminium and tungsten deposits on the reflectivity of molybdenum mirrors as well as the possibility to clean them with plasma exposure is investigated. Porous ITER-like deposits are grown to mimic the edge conditions expected in ITER, and a severe degradation in the specular reflectivity is observed as these deposits build up on the mirror surface. In addition, dense oxide films are produced for comparisons with porous films. The composition, morphology and crystal structure of several films were characterized by means of scanning electron microscopy, x-ray photoelectron spectroscopy, x-ray diffraction and secondary ion mass spectrometry. The cleaning of the deposits and the restoration of the mirrors' optical properties are possible either with a Kaufman source or radio frequency directly applied to the mirror (or radio frequency plasma generated directly around the mirror surface). Accelerating ions of an external plasma source through a direct current applied onto the mirror does not remove deposits composed of oxides. A possible implementation of plasma cleaning in ITER is addressed.

Plasma jet takes off.

PubMed Central

Frazer, L

1999-01-01

Thanks to a series of joint research projects by Los Alamos National Laboratory, Beta Squared of Allen, Texas, and the University of California at Los Angeles, there is now a more environmentally sound method for cleaning semiconductor chips that may also be effective in cleaning up chemical, bacterial, and nuclear contaminants. The Atmospheric Pressure Plasma Jet uses a type of ionized gas called plasma to clean up contaminants by binding to them and lifting them away. In contrast to the corrosive acids and chemical solvents traditionally used to clean semiconductor chips, the jet oxidizes contaminants, producing only benign gaseous by-products such as oxygen and carbon dioxide. The new technology is also easy to transport, cleans thoroughly and quickly, and presents no hazards to its operators. PMID:10417375

Aerosol emission monitoring in the production of silicon carbide nanoparticles by induction plasma synthesis

NASA Astrophysics Data System (ADS)

Thompson, Drew; Leparoux, Marc; Jaeggi, Christian; Buha, Jelena; Pui, David Y. H.; Wang, Jing

2013-12-01

In this study, the synthesis of silicon carbide (SiC) nanoparticles in a prototype inductively coupled thermal plasma reactor and other supporting processes, such as the handling of precursor material, the collection of nanoparticles, and the cleaning of equipment, were monitored for particle emissions and potential worker exposure. The purpose of this study was to evaluate the effectiveness of engineering controls and best practice guidelines developed for the production and handling of nanoparticles, identify processes which result in a nanoparticle release, characterize these releases, and suggest possible administrative or engineering controls which may eliminate or control the exposure source. No particle release was detected during the synthesis and collection of SiC nanoparticles and the cleaning of the reactor. This was attributed to most of these processes occurring in closed systems operated at slight underpressure. Other tasks occurring in more open spaces, such as the disconnection of a filter assembly from the reactor system and the use of compressed air for the cleaning of filters where synthesized SiC nanoparticles were collected, resulted in releases of submicrometer particles with a mode size of 170-180 nm. Observation of filter samples under scanning electron microscope confirmed that the particles were agglomerates of SiC nanoparticles.

RF plasma cleaning of silicon substrates with high-density polyethylene contamination

NASA Astrophysics Data System (ADS)

Cagomoc, Charisse Marie D.; De Leon, Mark Jeffry D.; Ebuen, Anna Sophia M.; Gilos, Marlo Nicole R.; Vasquez, Magdaleno R., Jr.

2018-01-01

Upon contact with a polymeric material, microparticles from the polymer may adhere to a silicon (Si) substrate during device processing. The adhesion contaminates the surface and, in turn, leads to defects in the fabricated Si-based microelectronic devices. In this study, Si substrates with artificially induced high-density polyethylene (HDPE) contamination was exposed to 13.56 MHz radio frequency (RF) plasma utilizing argon and oxygen gas admixtures at a power density of 5.6 W/cm2 and a working pressure of 110 Pa for up to 6 min of treatment. Optical microscopy studies revealed the removal of up to 74% of the polymer contamination upon plasma exposure. Surface free energy (SFE) increased owing to the removal of contaminants as well as the formation of polar groups on the Si surface after plasma treatment. Atomic force microscopy scans showed a decrease in surface roughness from 12.25 nm for contaminated samples to 0.77 nm after plasma cleaning. The smoothening effect can be attributed to the removal of HDPE particles from the surface. In addition, scanning electron microscope images showed that there was a decrease in the amount of HDPE contaminants adhering onto the surface after plasma exposure.

Active cleaning technique device

NASA Technical Reports Server (NTRS)

Shannon, R. L.; Gillette, R. B.

1973-01-01

The objective of this program was to develop a laboratory demonstration model of an active cleaning technique (ACT) device. The principle of this device is based primarily on the technique for removing contaminants from optical surfaces. This active cleaning technique involves exposing contaminated surfaces to a plasma containing atomic oxygen or combinations of other reactive gases. The ACT device laboratory demonstration model incorporates, in addition to plasma cleaning, the means to operate the device as an ion source for sputtering experiments. The overall ACT device includes a plasma generation tube, an ion accelerator, a gas supply system, a RF power supply and a high voltage dc power supply.

Method and apparatus for monitoring plasma processing operations

DOEpatents

Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise

2001-01-01

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

Method and apparatus for monitoring plasma processing operations

DOEpatents

Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise

2001-01-01

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discemible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

Method and apparatus for monitoring plasma processing operations

DOEpatents

Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise

2000-01-01

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

Method and apparatus for monitoring plasma processing operations

DOEpatents

Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise

2002-07-16

The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

Effect of remote inductively coupled plasma (ICP) on the electron energy probability function of an in-tandem main ICP

NASA Astrophysics Data System (ADS)

Lee, Jaewon; Kim, Kyung-Hyun; Chung, Chin-Wook

2017-02-01

The remote plasma has been generally used as the auxiliary plasma source for indirect plasma processes such as cleaning or ashing. When tandem plasma sources that contain main and remote plasma sources are discharged, the main plasma is affected by the remote plasma and vice versa. Charged particles can move between two chambers due to the potential difference between the two plasmas. For this reason, the electron energy possibility function of the main plasma can be controlled by adjusting the remote plasma state. In our study, low energy electrons in the main plasma are effectively heated with varying remote plasma powers, and high energy electrons which overcome potential differences between two plasmas—are exchanged with no remarkable change in the plasma density and the effective electron temperature.

Processing for Highly Efficient AlGaN/GaN Emitters

DTIC Science & Technology

2009-09-09

effects of SiCl4 plasma treatment and subsequent cleaning in BOE, HCl, and NH4OH solutions on n-GaN and n- AlGaN surfaces using XPS and AES. The...was the as-grown GaN layer without any surface treatment while sample 2 was treated with SiCl4 plasma in a reactive ion etching (RIE) system with a...plasma self-bias voltage of −300 V for 60 s. Samples 3, 4, and 5 were treated with SiCl4 plasma and followed by a 2-min dip in NH4OH, HCl, and BOE

Method for Cleaning Laser-Drilled Holes on Printed Wiring Boards by Plasma Treatment

NASA Astrophysics Data System (ADS)

Hirogaki, Toshiki; Aoyama, Eiichi; Minagi, Ryu; Ogawa, Keiji; Katayama, Tsutao; Matsuoka, Takashi; Inoue, Hisahiro

We propose a new method for cleaning blind via holes after laser drilling of PWBs using oxygen plasma treatment. This report dealt with three kinds of PWB materials: epoxy resin and two kinds of aramid fiber reinforced plastics (AFRP: Technora or Kevlar fiber reinforcement). We observed the drilled holes after plasma treatment using both an optical and a scanning electric microscope (SEM). It was confirmed that adequate etching took place in the drilled holes by plasma treatment. We also compared the hole wall and hole bottom after plasma treatment with ones after chemical etching. It was clear that there was no damage to the aramid fiber tip on the hole wall, and that a smooth roughness of the hole wall was obtained by means of plasma treatment. As a result, we demonstrated that the plasma treatment is effective in cleaning the laser drilled holes of PWBs.

Investigation of the effect of contaminations and cleaning processes on the surface properties of brazing surfaces

NASA Astrophysics Data System (ADS)

Bobzin, K.; Öte, M.; Wiesner, S.

2017-03-01

The quality of brazed joints is determined by different factors such as the atmosphere and the parameters during brazing as well as the condition of the brazing surfaces. Residues of lubricants used during machining of the components and the subsequent cleaning processes can contaminate the faying surfaces and can hence influence the flow ability of the molten filler metals. Besides their influence on the filler metal flow, the residues can result in the formation of carbonic phases in the joint leading to a possible reduction of the corrosion resistance and the mechanical properties. The first step of the current study with the aim of avoiding these defects is to identify the influence of critical contaminations and cleaning methods on the quality of the brazed joints. In a first step, contaminations on AISI304 and Inconel alloy 625 due to different cooling lubricants and the effect of several cleaning methods, in particular plasma cleaning, have been investigated. Information about the surface energy of contaminated and cleaned surfaces was gained by measuring contact angle of testing fluids. Additionally, the lubricants and the resulting contamination products have been analyzed considering the influence of a heat treatment.

Nanoscale control of energy and matter in plasma-surface interactions: towards energy-efficient nanotech

NASA Astrophysics Data System (ADS)

Ostrikov, Kostya

2010-11-01

This presentation focuses on the plasma issues related to the solution of the grand challenge of directing energy and matter at nanoscales. This ability is critical for the renewable energy and energy-efficient technologies for sustainable future development. It will be discussed how to use environmentally and human health benign non-equilibrium plasma-solid systems and control the elementary processes of plasma-surface interactions to direct the fluxes of energy and matter at multiple temporal and spatial scales. In turn, this makes it possible to achieve the deterministic synthesis of self- organised arrays of metastable nanostructures in the size range beyond the reach of the present-day nanofabrication. Such structures have tantalising prospects to enhance performance of nanomaterials in virtually any area of human activity yet remain almost inaccessible because the Nature's energy minimisation rules allow only a small number of stable equilibrium states. By using precisely controlled and kinetically fast nanoscale transfer of energy and matter under non-equilibrium conditions and harnessing numerous plasma- specific controls of species creation, delivery to the surface, nucleation and large-scale self-organisation of nuclei and nanostructures, the arrays of metastable nanostructures can be created, arranged, stabilised, and further processed to meet the specific requirements of the envisaged applications. These approaches will eventually lead to faster, unprecedentedly- clean, human-health-friendly, and energy-efficient nanoscale synthesis and processing technologies for the next-generation renewable energy and light sources, biomedical devices, information and communication systems, as well as advanced functional materials for applications ranging from basic food, water, health and clean environment needs to national security and space missions.

In situ oxygen plasma cleaning of microswitch surfaces—comparison of Ti and graphite electrodes

NASA Astrophysics Data System (ADS)

Oh, Changho; Streller, Frank; Ashurst, W. Robert; Carpick, Robert W.; de Boer, Maarten P.

2016-11-01

Ohmic micro- and nanoswitches are of interest for a wide variety of applications including radio frequency communications and as low power complements to transistors. In these switches, it is of paramount importance to maintain surface cleanliness in order to prevent frequent failure by tribopolymer growth. To prepare surfaces, an oxygen plasma clean is expected to be beneficial compared to a high temperature vacuum bakeout because of shorter cleaning time (<5 min compared to ~24 h) and active removal of organic contaminants. We demonstrate that sputtering of the electrode material during oxygen plasma cleaning is a critical consideration for effective cleaning of switch surfaces. With Ti electrodes, a TiO x layer forms that increases electrical contact resistance. When plasma-cleaned using graphite electrodes, the resistance of Pt-coated microswitches exhibit a long lifetime with consistently low resistance (<0.5 Ω variation over 300 million cycles) if the test chamber is refilled with ultra-high purity nitrogen and if the devices are not exposed to laboratory air. Their current-voltage characteristic is also linear at the millivolt level. This is important for nanoswitches which will be operated in that range.

Alternative Green Solvents Project

NASA Technical Reports Server (NTRS)

Maloney, Phillip R.

2012-01-01

Necessary for safe and proper functioning of equipment. Mainly halogenated solvents. Tetrachloride, Trichloroethylene (TCE), CFC-113. No longer used due to regulatory/safety concerns. Precision Cleaning at KSC: Small % of total parts. Used for liquid oxygen (LOX) systems. Dual solvent process. Vertrel MCA (decafluoropentane (DFP) and trons-dichloroethylene) HFE-7100. DFP has long term environmental concerns. Project Goals: a) Identify potential replacements. b) 22 wet chemical processes. c) 3 alternative processes. d) Develop test procedures. e) Contamination and cleaning. f) Analysis. g) Use results to recommend alternative processes. Conclusions: a) No alternative matched Vertrel in this study. b) No clear second place solvent. c) Hydrocarbons- easy; Fluorinated greases- difficult. d) Fluorinated component may be needed in replacement solvent. e) Process may need to make up for shortcoming of the solvent. f) Plasma and SCC02 warrant further testing.

Evaluation of Low-Pressure Cold Plasma for Disinfection of ISS Grown Produce and Metallic Instrumentation

NASA Technical Reports Server (NTRS)

Hintze, Paul E.; Franco, Carolina; Hummerick, Mary E.; Maloney, Phil R.; Spencer, Lashelle E.

2017-01-01

Cold plasma (CP) cleaning is a dry, non-thermal process, which can provide broad-spectrum antimicrobial activity yet reportedly causes little to no damage to the object being sanitized. Since cold plasma uses no liquids, it has the distinct advantage when used in microgravity of not having to separate liquids from the item being cleaned. This paper will present results on an effort to use low pressure CP to disinfect or sterilize materials for in space applications. Exposure times from 0 to 60 minutes and pressures ranging from 0.10 to 1.0 mbar were used to optimize plasma parameters. Tests were done on produce and metal coupons to simulate medical equipment. Escherichia coli was used as the challenge organism on produce and Bacillus pumilus SAFR-32 was used on metal surfaces. Produce testing was not successful, with unacceptable kill rates and the produce being negatively impacted by exposure to the plasma. The plasma caused a 5 log reduction in the number of viable bacteria on metal coupon tests, which placed the number of viable bacteria below the detection limit. This is a very promising result showing that sterilization of medical equipment with cold plasma is feasible. Scanning Electron Microscope images were taken before and after exposure. The images after plasma exposure show that the bacteria spores have been physically affected, as their size has gotten smaller and their appearance has changed.

Plasma Radiofrequency Discharges as Cleaning Technique for the Removal of C-W Coatings

NASA Astrophysics Data System (ADS)

Cremona, A.; Vassallo, E.; Caniello, R.; Ghezzi, F.; Grosso, G.; Laguardia, L.

2013-06-01

Erosion of materials by chemical and physical sputtering is one of the most concern of plasma wall interaction in tokamaks. In divertor ITER-like tokamaks, where carbon and tungsten are planned to be used, hydrogenated C-W mixed compounds are expected to form by erosion, transport and re-deposition processes. The selection of these materials as divertor components involves lifetime and safety issues due to tritium retention in carbon co-deposits. In this paper a cleaning technique based on RF (13.56 MHz) capacitively coupled H2/Ar plasmas has been used to remove C-W mixed materials from test specimens. The dependence of the removal rate on the H2/Ar ratio and on the plasma pressure has been investigated by X-ray photoelectron spectroscopy, atomic force microscopy, profilometry as regards the solid phase and by Langmuir probe and optical emission spectroscopy as regards the plasma phase. The best result has been obtained with a H2/Ar ratio of 10/90 at a pressure of 1 Pa. An explanation based on a synergistic effect between physical sputtering due to energetic ions and chemical etching due to radicals, together with the pressure dependence of the ion energy distribution function, is given.

Lumen claims of the STERRAD 100NX sterilizer: testing performance limits when processing equipment containing long, narrow lumens.

PubMed

Diab-Elschahawi, Magda; Blacky, Alexander; Bachhofner, Nicole; Koller, Walter

2011-11-01

According to manufacturers information, the STERRAD 100NX sterilizer-a low temperature H(2)O(2) gas plasma sterilizer-can adequately process single channel stainless steel lumens with an inside diameter of 0.7 mm or larger and a maximum length of 500 mm using standard cycle sterilizing conditions. The aim of this study was to qualify the performance of this H(2)O(2) gas plasma sterilizer under different experimental settings representing worst case conditions. Inoculated carriers were placed at the midpoint position of specified lumens and then submitted to flex scope sterilizing conditions. To simulate insufficient cleaning or crystalline residues, we added organic and inorganic challenges to our inoculated carriers. For experiments done with unchallenged carriers, quantitative analysis reached a log(10) reduction rate of ≥5.71, whereas qualitative results showed no growth in 24 out of 30 biologic indicators tested using flex scope half cycle conditions. Any additional kind of challenge significantly impaired the sterilization outcome. The findings of our current study emphasize the importance of a thorough validated cleaning of medical devices as well as timing for cleaning and decontamination before being exposed to the H(2)O(2) sterilization process and, furthermore, the need for strict adherence to manufacturer's recommendations. Copyright © 2011 Association for Professionals in Infection Control and Epidemiology, Inc. Published by Mosby, Inc. All rights reserved.

In situ plasma removal of surface contaminants from ion trap electrodes

DOE Office of Scientific and Technical Information (OSTI.GOV)

Haltli, Raymond A.

2015-05-01

In this thesis, the construction and implementation of an in situ plasma discharge designed to remove surface contaminants from electrodes in an ion trapping experimental system is presented with results. In recent years, many advances have been made in using ion traps for quantum information processing. All of the criteria defined by DiVincenzo for using ion traps for implementing a quantum computer have been individually demonstrated, and in particular surface traps provide a scalable platform for ions. In order to be used for quantum algorithms, trapped ions need to be cooled to their motional (quantum mechanical) ground state. One ofmore » the hurdles in integrating surface ion traps for a quantum computer is minimizing electric field noise, which causes the ion to heat out of its motional ground state and which increases with smaller ion-to-electrode distances realized with surface traps. Surface contamination of trap electrodes is speculated to be the primary source of electric field noise. The main goal achieved by this work was to implement an in situ surface cleaning solution for surface electrode ion traps, which would not modify the ion trap electrode surface metal. Care was taken in applying the RF power in order to localize a plasma near the trap electrodes. A method for characterizing the energy of the plasma ions arriving at the ion trap surface is presented and results for plasma ion energies are shown. Finally, a method for quantifying the effectiveness of plasma cleaning of trap electrodes, using the surface analysis technique of X-ray photoelectron spectroscopy for measuring the amount and kind of surface contaminants, is described. A significant advantage of the trap electrode surface cleaning method presented here is the minimal changes necessary for implementation on a working ion trap experimental system.« less

Dual Electrolytic Plasma Processing for Steel Surface Cleaning and Passivation

NASA Astrophysics Data System (ADS)

Yang, L.; Zhang, P.; Shi, J.; Liang, J.; Tian, W. B.; Zhang, Y. M.; Sun, Z. M.

2017-10-01

To remove the rust on rebars and passivate the fresh surfaces, electrodes reversing electrolytic plasma processing (EPP) was proposed and conducted in a 10 wt.% Na2CO3 aqueous solution. The morphology and the composition of the surface were investigated by SEM and XPS. Experimental results show that the rust on the surface was removed effectively by cathode EPP, and a passive film containing Cr2O3 was achieved by the succeeding anode EPP treatment, by a simple operation of reversing the bias. The corrosion resistance was evaluated in a 3.5 wt.% NaCl aqueous solution using an electrochemical workstation. In comparison, the corrosion resistance was improved by the succeeding anode EPP treatment, which is evidenced by a positive shift of the open-circuit potential, an increase in the electrochemical impedance representing the inner layer by 76.8% and the decrease in the corrosion current density by 49.6%. This is an effective and environment-friendly technique to clean and passivate rebars and similar steel materials.

Argon–germane in situ plasma clean for reduced temperature Ge on Si epitaxy by high density plasma chemical vapor deposition

DOE PAGES

Douglas, Erica A.; Sheng, Josephine J.; Verley, Jason C.; ...

2015-06-04

We found that the demand for integration of near infrared optoelectronic functionality with silicon complementary metal oxide semiconductor (CMOS) technology has for many years motivated the investigation of low temperature germanium on silicon deposition processes. Our work describes the development of a high density plasma chemical vapor deposition process that uses a low temperature (<460 °C) in situ germane/argon plasma surface preparation step for epitaxial growth of germanium on silicon. It is shown that the germane/argon plasma treatment sufficiently removes SiO x and carbon at the surface to enable germanium epitaxy. Finally, the use of this surface preparation step demonstratesmore » an alternative way to produce germanium epitaxy at reduced temperatures, a key enabler for increased flexibility of integration with CMOS back-end-of-line fabrication.« less

Investigation of Proposed Process Sequence for the Array Automated Assembly Task, Phase 2. [low cost silicon solar array fabrication

NASA Technical Reports Server (NTRS)

Mardesich, N.; Garcia, A.; Bunyan, S.; Pepe, A.

1979-01-01

The technological readiness of the proposed process sequence was reviewed. Process steps evaluated include: (1) plasma etching to establish a standard surface; (2) forming junctions by diffusion from an N-type polymeric spray-on source; (3) forming a p+ back contact by firing a screen printed aluminum paste; (4) forming screen printed front contacts after cleaning the back aluminum and removing the diffusion oxide; (5) cleaning the junction by a laser scribe operation; (6) forming an antireflection coating by baking a polymeric spray-on film; (7) ultrasonically tin padding the cells; and (8) assembling cell strings into solar circuits using ethylene vinyl acetate as an encapsulant and laminating medium.

Plasma process control with optical emission spectroscopy

NASA Astrophysics Data System (ADS)

Ward, P. P.

Plasma processes for cleaning, etching and desmear of electronic components and printed wiring boards (PWB) are difficult to predict and control. Non-uniformity of most plasma processes and sensitivity to environmental changes make it difficult to maintain process stability from day to day. To assure plasma process performance, weight loss coupons or post-plasma destructive testing must be used. The problem with these techniques is that they are not real-time methods and do not allow for immediate diagnosis and process correction. These methods often require scrapping some fraction of a batch to insure the integrity of the rest. Since these methods verify a successful cycle with post-plasma diagnostics, poor test results often determine that a batch is substandard and the resulting parts unusable. Both of these methods are a costly part of the overall fabrication cost. A more efficient method of testing would allow for constant monitoring of plasma conditions and process control. Process failures should be detected before the parts being treated. are damaged. Real time monitoring would allow for instantaneous corrections. Multiple site monitoring would allow for process mapping within one system or simultaneous monitoring of multiple systems. Optical emission spectroscopy conducted external to the plasma apparatus would allow for this sort of multifunctional analysis without perturbing the glow discharge. In this paper, optical emission spectroscopy for non-intrusive, in situ process control will be explored. A discussion of this technique as it applies towards process control, failure analysis and endpoint determination will be conducted. Methods for identifying process failures, progress and end of etch back and desmear processes will be discussed.

Repetitive cleaning of a stainless steel first mirror using radio frequency plasma

NASA Astrophysics Data System (ADS)

Peng, Jiao; Yan, Rong; Ding, Rui; Chen, Junling; Zhu, Dahuan; Zhang, Zengming

2017-10-01

First mirrors (FMs) are crucial components of optical diagnostic systems in present-day tokamaks and future fusion reactors. Their lifetimes should be extremely limited due to their proximity to burning plasma, greatly influencing the safe operation of corresponding diagnostics. Repetitive cleaning is expected to provide a solution to the frequent replacement of contaminated FMs, thus prolonging their lifetimes. Three repetitive cleaning cycles using radio frequency plasma were applied to stainless steel (SS) FM samples, to evaluate the change of the mirrors’ optical properties and morphology during each cycle. Amorphous carbon films were deposited on mirror surfaces under identical conditions in three cycles. In three cycles with identical cleaning parameters, the total reflectivity was restored at up to 95%. Nevertheless, with successive cleaning cycles, the FM surfaces gradually appeared to roughen due to damage to the grain boundaries. Correspondingly, the diffuse reflectivity increased from a few percent to 20% and 27% after the second and third cycles. After optimizing the cleaning parameters of the second and third cycles, the roughness showed a significant decrease, and simultaneously the increase of diffuse reflectivity was remarkably improved.

Evaluation of Low-Pressure Cold Plasma for Disinfection for ISS Grown Produce and Metallic Instrumentation

NASA Technical Reports Server (NTRS)

Hintze, Paul E.; Franco, Carolina; Hummerick, Mary E.; Maloney, Phillip R.; Spencer, Lashelle E.

2017-01-01

Cold plasma (CP) cleaning is a dry, non-thermal process, which can provide broad-spectrum antimicrobial activity yet reportedly causes little to no damage to the object being sanitized. Since cold plasma uses no liquids, it has the distinct advantage when used in microgravity of not having to separate liquids from the item being cleaned. This paper will present results on an effort to use low pressure CP to disinfect or sterilize materials for in space applications. Exposure times from 0 to 60 minutes and pressures ranging from 10 to 100 Pa were used to optimize plasma parameters to achieve acceptable kill rates for 3 bacteria, Bacillus cereus, E. coli and Bacillus pumulis SAFR-32 and one fungi, Aspergillus niger. These tests were done on produce and metal coupons to simulate medical equipment. Produce testing was not successful, with unacceptable kill rates and the produce being negatively impacted by exposure to the plasma. The plasma caused a 5 log reduction in the number of viable bacteria on metal coupon tests, which placed the number of viable bacteria below the detection limit. This is a very promising result showing that sterilization of medical equipment with cold plasma is feasible. Scanning Electron Microscope images were taken before and after exposure. The images after plasma exposure shows that the bacteria spores have been physically affected, as their size has gotten smaller and the appearance has changed.

Plasma-assisted oxide removal from ruthenium-coated EUV optics

NASA Astrophysics Data System (ADS)

Dolgov, A.; Lee, C. J.; Bijkerk, F.; Abrikosov, A.; Krivtsun, V. M.; Lopaev, D.; Yakushev, O.; van Kampen, M.

2018-04-01

An experimental study of oxide reduction at the surface of ruthenium layers on top of multilayer mirrors and thin Ru/Si films is presented. Oxidation and reduction processes were observed under conditions close to those relevant for extreme ultraviolet lithography. The oxidized ruthenium surface was exposed to a low-temperature hydrogen plasma, similar to the plasma induced by extreme ultraviolet radiation. The experiments show that hydrogen ions are the main reducing agent. Furthermore, the addition of hydrogen radicals increases the reduction rate beyond that expected from simple flux calculations. We show that low-temperature hydrogen plasmas can be effective for reducing oxidized top surfaces. Our proof-of-concept experiments show that an in situ, EUV-generated plasma cleaning technology is feasible.

Plasma cleaning and analysis of archeological artefacts from Sipán

NASA Astrophysics Data System (ADS)

Saettone, E. A. O.; da Matta, J. A. S.; Alva, W.; Chubaci, J. F. O.; Fantini, M. C. A.; Galvão, R. M. O.; Kiyohara, P.; Tabacniks, M. H.

2003-04-01

A novel procedure using plasma sputtering in an electron-cyclotron-resonance device has been applied to clean archeological MOCHE artefacts, unearthed at the Royal Tombs of Sipán. After successful cleaning, the pieces were analysed by a variety of complementary techniques, namely proton-induced x-ray emission, Rutherford backscattering spectroscopy, x-ray diffraction, electron microscopy, and inductively coupled plasma mass spectroscopy. With these techniques, it has been possible to not only determine the profiles of the gold and silver surface layers, but also to detect elements that may be relevant to explain the gilding techniques skillfully developed by the metal smiths of the MOCHE culture.

40 CFR Table I-4 to Subpart I of... - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates...

Code of Federal Regulations, 2013 CFR

2013-07-01

... C5F8 C4F8O Plasma Etching 1-Ui 0.80 0.80 0.48 0.14 NA 0.29 0.32 0.37 0.09 NA NA BCF4 NA NA 0.0018 0... NA NA NA NA NA Chamber Cleaning In situ plasma cleaning: 1-Ui NA NA NA NA NA NA 0.23 NA NA NA NA BCF4... NA NA NA NA NA Remote Plasma Cleaning: 1-Ui NA NA NA NA 0.063 NA 0.018 NA NA NA NA BCF4 NA NA NA NA...

The influence of sterilization on nitrogen-included ultrananocrystalline diamond for biomedical applications.

PubMed

Tong, Wei; Tran, Phong A; Turnley, Ann M; Aramesh, Morteza; Prawer, Steven; Brandt, Milan; Fox, Kate

2016-04-01

Diamond has shown great potential in different biomedical applications, but the effects of sterilization on its properties have not been investigated. Here, we studied the influence of five sterilization techniques (solvent cleaning, oxygen plasma, UV irradiation, autoclave and hydrogen peroxide) on nitrogen-included ultrananocrystalline diamond. The chemical modification of the diamond surface was evaluated using X-ray photoelectron spectroscopy and water contact angle measurements. Different degrees of surface oxidation and selective sp(2) bonded carbon etching were found following all sterilization techniques, resulting in an increase of hydrophilicity. Higher viabilities of in vitro mouse 3T3 fibroblasts and rat cortical neuron cells were observed on oxygen plasma, autoclave and hydrogen peroxide sterilized diamond, which correlated with their higher hydrophilicity. By examination of apatite formation in simulated body fluid, in vivo bioactivity was predicted to be best on those surfaces which have been oxygen plasma treated and lowest on those which have been exposed to UV irradiation. The charge injection properties were also altered by the sterilization process and there appears to be a correlation between these changes and the degree of oxygen termination of the surface. We find that the modification brought by autoclave, oxygen plasma and hydrogen peroxide were most consistent with the use of N-UNCD in biological applications as compared to samples sterilized by solvent cleaning or UV exposure or indeed non-sterilized. A two-step process of sterilization by hydrogen peroxide following oxygen plasma treatment was then suggested. However, the final choice of sterilization technique will depend on the intended end application. Copyright © 2015 Elsevier B.V. All rights reserved.

Scalable graphene production from ethanol decomposition by microwave argon plasma torch

NASA Astrophysics Data System (ADS)

Melero, C.; Rincón, R.; Muñoz, J.; Zhang, G.; Sun, S.; Perez, A.; Royuela, O.; González-Gago, C.; Calzada, M. D.

2018-01-01

A fast, efficient and simple method is presented for the production of high quality graphene on a large scale by using an atmospheric pressure plasma-based technique. This technique allows to obtain high quality graphene in powder in just one step, without the use of neither metal catalysts and nor specific substrate during the process. Moreover, the cost for graphene production is significantly reduced since the ethanol used as carbon source can be obtained from the fermentation of agricultural industries. The process provides an additional benefit contributing to the revalorization of waste in the production of a high-value added product like graphene. Thus, this work demonstrates the features of plasma technology as a low cost, efficient, clean and environmentally friendly route for production of high-quality graphene.

40 CFR Table I-3 to Subpart I of... - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates...

Code of Federal Regulations, 2012 CFR

2012-07-01

... C4F6 C5F8 C4F8O Plasma Etching 1-Ui 0.69 0.56 0.38 0.093 NA 0.25 0.038 0.20 0.14 NA NA BCF4 NA 0.23 0... NA NA NA NA NA NA NA Chamber Cleaning In situ plasma cleaning: 1-Ui 0.92 0.55 NA NA 0.40 0.10 0.18 NA... BC3F8 NA NA NA NA NA NA NA NA NA NA NA Remote plasma cleaning: 1-Ui NA NA NA NA NA NA 0.018 NA NA NA NA...

40 CFR Table I-3 to Subpart I of... - Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates...

Code of Federal Regulations, 2013 CFR

2013-07-01

... C4F6 C5F8 C4F8O Plasma Etching 1-Ui 0.69 0.56 0.38 0.093 NA 0.25 0.038 0.20 0.14 NA NA BCF4 NA 0.23 0... NA NA NA NA NA NA NA Chamber Cleaning In situ plasma cleaning: 1-Ui 0.92 0.55 NA NA 0.40 0.10 0.18 NA... BC3F8 NA NA NA NA NA NA NA NA NA NA NA Remote plasma cleaning: 1-Ui NA NA NA NA NA NA 0.018 NA NA NA NA...

Using atmospheric pressure plasma treatment for treating grey cotton fabric.

PubMed

Kan, Chi-Wai; Lam, Chui-Fung; Chan, Chee-Kooi; Ng, Sun-Pui

2014-02-15

Conventional wet treatment, desizing, scouring and bleaching, for grey cotton fabric involves the use of high water, chemical and energy consumption which may not be considered as a clean process. This study aims to investigate the efficiency of the atmospheric pressure plasma (APP) treatment on treating grey cotton fabric when compared with the conventional wet treatment. Grey cotton fabrics were treated with different combinations of plasma parameters with helium and oxygen gases and also through conventional desizing, scouring and bleaching processes in order to obtain comparable results. The results obtained from wicking and water drop tests showed that wettability of grey cotton fabrics was greatly improved after plasma treatment and yielded better results than conventional desizing and scouring. The weight reduction of plasma treated grey cotton fabrics revealed that plasma treatment can help remove sizing materials and impurities. Chemical and morphological changes in plasma treated samples were analysed by FTIR and SEM, respectively. Finally, dyeability of the plasma treated and conventional wet treated grey cotton fabrics was compared and the results showed that similar dyeing results were obtained. This can prove that plasma treatment would be another choice for treating grey cotton fabrics. Copyright © 2013 Elsevier Ltd. All rights reserved.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hora, H.; Korn, G.; Eliezer, S.

Measured highly elevated gains of proton–boron (HB11) fusion (Picciottoet al., Phys. Rev. X4, 031030 (2014)) confirmed the exceptional avalanche reaction process (Lalousiset al., Laser Part. Beams 32, 409 (2014); Horaet al., Laser Part. Beams33, 607 (2015)) for the combination of the non-thermal block ignition using ultrahigh intensity laser pulses of picoseconds duration. The ultrahigh accelerationabovemore » $$10^{20}~\\text{cm}~\\text{s}^{-2}$$ for plasma blocks was theoretically and numerically predicted since 1978 (Hora,Physics of Laser Driven Plasmas(Wiley, 1981), pp. 178 and 179) and measured (Sauerbrey, Phys. Plasmas3, 4712 (1996)) in exact agreement (Horaet al., Phys. Plasmas14, 072701 (2007)) when the dominating force was overcoming thermal processes. This is based on Maxwell’s stress tensor by the dielectric properties of plasma leading to the nonlinear (ponderomotive) force $$f_{\\text{NL}}$$ resulting in ultra-fast expanding plasma blocks by a dielectric explosion. Combining this with measured ultrahigh magnetic fields and the avalanche process opens an option for an environmentally absolute clean and economic boron fusion power reactor. Finally, this is supported also by other experiments with very high HB11 reactions under different conditions (Labauneet al., Nature Commun.4, 2506 (2013)).« less

The Selective Epitaxy of Silicon at Low Temperatures.

NASA Astrophysics Data System (ADS)

Lou, Jen-Chung

1991-01-01

This dissertation has developed a process for the selective epitaxial growth (SEG) of silicon at low temperatures using a dichlorosilane-hydrogen mixture in a hot-wall low pressure chemical vapor deposition (LPCVD) reactor. Some basic issues concerning the quality of epilayers --substrate preparation, ex-situ and in-situ cleaning, and deposition cycle, have been studied. We find it necessary to use a plasma etch to open epitaxial windows for the SEG of Si. A cycled plasma etch, a thin sacrificial oxide growth, and an oxide etching step can completely remove plasma-etch-induced surface damage and contaminants, which result in high quality epilayers. A practical wafer cleaning step is developed for low temperature Si epitaxial growth. An ex-situ HF vapor treatment can completely remove chemical oxide from the silicon surface and retard the reoxidation of the silicon surface. An in-situ low-concentration DCS cycle can aid in decomposition of surface oxide during a 900 ^circC H_2 prebake step. An HF vapor treatment combined with a low-concentration of DCS cycle consistently achieves defect-free epilayers at 850^circC and lower temperatures. We also show that a BF_sp{2}{+ } or F^+ ion implantation is a potential ex-situ wafer cleaning process for SEG of Si at low temperatures. The mechanism for the formation of surface features on Si epilayers is also discussed. Based on O ^+ ion implantation, we showed that the oxygen incorporation in silicon epilayers suppresses the Si growth rate. Therefore, we attribute the formation of surface features to the local reduction of the Si growth rate due to the dissolution of oxide islands at the epi/substrate interface. Finally, with this developed process for the SEG of silicon, defect-free overgrown epilayers are also obtained. This achievement demonstrates the feasibility for the future silicon-on-oxide (SOI) manufacturing technology.

Alternative Solvents and Technologies for Precision Cleaning of Aerospace Components

NASA Technical Reports Server (NTRS)

Grandelli, Heather; Maloney, Phillip; DeVor, Robert; Hintze, Paul

2014-01-01

Precision cleaning solvents for aerospace components and oxygen fuel systems, including currently used Vertrel-MCA, have a negative environmental legacy, high global warming potential, and have polluted cleaning sites. Thus, alternative solvents and technologies are being investigated with the aim of achieving precision contamination levels of less than 1 mg/sq ft. The technologies being evaluated are ultrasonic bath cleaning, plasma cleaning and supercritical carbon dioxide cleaning.

Large-Volume Resonant Microwave Discharge for Plasma Cleaning of a CEBAF 5-Cell SRF Cavity

DOE Office of Scientific and Technical Information (OSTI.GOV)

J. Mammosser, S. Ahmed, K. Macha, J. Upadhyay, M. Nikoli, S. Popovi, L. Vuakovi

2012-07-01

We report the preliminary results on plasma generation in a 5-cell CEBAF superconducting radio-frequency (SRF) cavity for the application of cavity interior surface cleaning. CEBAF currently has {approx}300 of these five cell cavities installed in the Jefferson Lab accelerator which are mostly limited by cavity surface contamination. The development of an in-situ cavity surface cleaning method utilizing a resonant microwave discharge could lead to significant CEBAF accelerator performance improvement. This microwave discharge is currently being used for the development of a set of plasma cleaning procedures targeted to the removal of various organic, metal and metal oxide impurities. These contaminantsmore » are responsible for the increase of surface resistance and the reduction of RF performance in installed cavities. The CEBAF five cell cavity volume is {approx} 0.5 m2, which places the discharge in the category of large-volume plasmas. CEBAF cavity has a cylindrical symmetry, but its elliptical shape and transversal power coupling makes it an unusual plasma application, which requires special consideration of microwave breakdown. Our preliminary study includes microwave breakdown and optical spectroscopy, which was used to define the operating pressure range and the rate of removal of organic impurities.« less

Development of a laboratory demonstration model active cleaning device

NASA Technical Reports Server (NTRS)

Shannon, R. L.; Gillette, R. B.

1975-01-01

A laboratory demonstration model of a device for removing contaminant films from optical surfaces in space was developed. The development of a plasma tube, which would produce the desired cleaning effects under high vacuum conditions, represented the major problem in the program. This plasma tube development is discussed, and the resulting laboratory demonstration-model device is described.

Preliminary study of fusion reactor: Solution of Grad Shapranov equation

NASA Astrophysics Data System (ADS)

Setiawan, Y.; Fermi, N.; Su'ud, Z.

2012-06-01

Nuclear fussion is prospective energy sources for the future due to the abundance of the fuel and can be categorized and clean energy sources. The problem is how to contain very hot plasma of temperature few hundreed million degrees safety and reliably. Tokamax type fussion reactors is considered as the most prospective concept. To analyze the plasma confining process and its movement Grad-Shavranov equation must be solved. This paper discuss about solution of Grad-Shavranov equation using Whittaker function. The formulation is then applied to the ITER design and example.

Open Air Silicon Deposition by Atmospheric Pressure Plasma under Local Ambient Gas Control

NASA Astrophysics Data System (ADS)

Naito, Teruki; Konno, Nobuaki; Yoshida, Yukihisa

2015-09-01

In this paper, we report open air silicon (Si) deposition by combining a silane free Si deposition technology and a newly developed local ambient gas control technology. Recently, material processing in open air has been investigated intensively. While a variety of materials have been deposited, there were only few reports on Si deposition due to the susceptibility to contamination and the hazardous nature of source materials. Since Si deposition is one of the most important processes in device fabrication, we have developed open air silicon deposition technologies in BEANS project. For a clean and safe process, a local ambient gas control head was designed. Process gas leakage was prevented by local evacuation, and air contamination was shut out by inert curtain gas. By numerical and experimental investigations, a safe and clean process condition with air contamination less than 10 ppm was achieved. Si film was deposited in open air by atmospheric pressure plasma enhanced chemical transport under the local ambient gas control. The film was microcrystalline Si with the crystallite size of 17 nm, and the Hall mobility was 2.3 cm2/V .s. These properties were comparable to those of Si films deposited in a vacuum chamber. This research has been conducted as one of the research items of New Energy and Industrial Technology Development Organization ``BEANS'' project.

Cobalt and iron segregation and nitride formation from nitrogen plasma treatment of CoFeB surfaces

NASA Astrophysics Data System (ADS)

Mattson, E. C.; Michalak, D. J.; Veyan, J. F.; Chabal, Y. J.

2017-02-01

Cobalt-iron-boron (CoFeB) thin films are the industry standard for ferromagnetic layers in magnetic tunnel junction devices and are closely related to the relevant surfaces of CoFe-based catalysts. Identifying and understanding the composition of their surfaces under relevant processing conditions is therefore critical. Here we report fundamental studies on the interaction of nitrogen plasma with CoFeB surfaces using infrared spectroscopy, x-ray photoemission spectroscopy, and low energy ion scattering. We find that, upon exposure to nitrogen plasma, clean CoFeB surfaces spontaneously reorganize to form an overlayer comprised of Fe2N3 and BN, with the Co atoms moved well below the surface through a chemically driven process. Subsequent annealing to 400 °C removes nitrogen, resulting in a Fe-rich termination of the surface region.

Baking and helium glow discharge cleaning of SST-1 Tokamak with graphite plasma facing components

NASA Astrophysics Data System (ADS)

Semwal, P.; Khan, Z.; Raval, D. C.; Dhanani, K. R.; George, S.; Paravastu, Y.; Prakash, A.; Thankey, P.; Ramesh, G.; Khan, M. S.; Saikia, P.; Pradhan, S.

2017-04-01

Graphite plasma facing components (PFCs) were installed inside the SST-1 vacuum vessel. Prior to installation, all the graphite tiles were baked at 1000 °C in a vacuum furnace operated below 1.0 × 10-5 mbar. However due to the porous structure of graphite, they absorb a significant amount of water vapour from air during the installation process. Rapid desorption of this water vapour requires high temperature bake-out of the PFCs at ≥ 250 °C. In SST-1 the PFCs were baked at 250 °C using hot nitrogen gas facility to remove the absorbed water vapour. Also device with large graphite surface area has the disadvantage that a large quantity of hydrogen gets trapped inside it during plasma discharges which makes density control difficult. Helium glow discharge cleaning (He-GDC) effectively removes this stored hydrogen as well as other impurities like oxygen and hydrocarbon within few nano-meters from the surface by particle induced desorption. Before plasma operation in SST-1 tokamak, both baking of PFCs and He-GDC were carried out so that these impurities were removed effectively. The mean desorption yield of hydrogen was found to be 0.24. In this paper the results of baking and He-GDC experiments of SST-1 will be presented in detail.

Characterization and global modelling of low-pressure hydrogen-based RF plasmas suitable for surface cleaning processes

NASA Astrophysics Data System (ADS)

Škoro, Nikola; Puač, Nevena; Lazović, Saša; Cvelbar, Uroš; Kokkoris, George; Gogolides, Evangelos

2013-11-01

In this paper we present results of measurements and global modelling of low-pressure inductively coupled H2 plasma which is suitable for surface cleaning applications. The plasma is ignited at 1 Pa in a helicon-type reactor and is characterized using optical emission measurements (optical actinometry) and electrical measurements, namely Langmuir and catalytic probe. By comparing catalytic probe data obtained at the centre of the chamber with optical actinometry results, an approximate calibration of the actinometry method as a semi-quantititative measure of H density was achieved. Coefficients for conversion of actinometric ratios to H densities are tabulated and provided. The approximate validity region of the simple actinometry formula for low-pressure H2 plasma is discussed in the online supplementary data (stacks.iop.org/JPhysD/46/475206/mmedia). Best agreement with catalytic probe results was obtained for (Hβ, Ar750) and (Hβ, Ar811) actinometric line pairs. Additionally, concentrations of electrons and ions as well as plasma potential, electron temperature and ion fluxes were measured in the chamber centre at different plasma powers using a Langmuir probe. Moreover, a global model of an inductively coupled plasma was formulated using a compiled reaction set for H2/Ar gas mixture. The model results compared reasonably well with the results on H atom and charge particle densities and a sensitivity analysis of important input parameters was conducted. The influence of the surface recombination, ionization, and dissociation coefficients, and the ion-neutral collision cross-section on model results was demonstrated.

A microwave plasma torch and its applications

NASA Astrophysics Data System (ADS)

Uhm, H. S.; Hong, Y. C.; Shin, D. H.

2006-05-01

A portable microwave plasma torch at atmospheric pressure by making use of magnetrons operated at 2.45 GHz and used in a home microwave oven has been developed. This electrodeless torch can be used in various areas including commercial, environmental and military applications. For example, perfluorocompounds (PFCs), which have long lifetimes and serious global warming implications, are widely used during plasma etching and plasma-assisted chamber cleaning processes in chemical vapour deposition systems. The microwave torch effectively eliminates PFCs. Efficient decomposition of toluene gas indicates the effectiveness of volatile organic compound eliminations from industrial emission and the elimination of airborne chemical and biological warfare agents. The microwave torch has been used to synthesize carbon nanotubes in an on-line system, thereby providing the opportunity of mass production of the nanotubes. There are other applications of the microwave plasma torch.

Collaborative Research: Fundamental Studies of Plasma Control Using Surface Embedded Electronic Devices

DOE Office of Scientific and Technical Information (OSTI.GOV)

Overzet, Lawrence J.; Raja, L.

The research program was collaborative between the researchers at the University of Texas at Dallas and the University of Texas at Austin. The primary subject of this program was to investigate the possibility of active control of secondary electron emission (SEE) from surfaces in contact with plasmas and thereby actively control plasmas. Very few studies of ion-induced electron emission (IIEE) from semiconductors exist, and those that do exist primarily used high-energy ion beams in the experiments. Furthermore, those few studies took extreme measures to ensure that the measurements were performed on atomically clean surfaces because of the surface sensitivity ofmore » the IIEE process. Even a small exposure to air can change the IIEE yield significantly. In addition, much of the existing data for IIEE from semiconductors was obtained in the 1950s and ‘60s, when semiconductor materials were first being refined. As a result, nearly all of that data is for p-type Ge and Si. Before this investigation, experimental data on n-type materials was virtually non-existent. While the basic theory assumed that IIEE yields ought to be substantially independent of doping type and concentration, recent measurements of near atmospheric pressure plasmas and of breakdown suggested otherwise. These indirect measurements were made on surfaces that were not atomically clean and seemed to indicate that deep sub-surface changes to the bulk conduction band electron density could lead to substantial variations in the IIEE yield. Exactly in contradiction to the generally accepted theory. Insufficient direct data existed to settle the matter. We performed both experimental measurements and theoretical calculations of IIEE yields from both Si and Ge in order to help clarify whether or not conduction band electrons substantially change the IIEE yield. We used three wafers of each material to carry out the investigation: a heavily doped p-type, an intrinsic and a heavily doped n-type wafer. There was approximately a factor of 10 15 difference in the conduction band electron densities of the p-type and n-type Si wafers and a factor of 10 10 for Ge. We investigated semiconductor surfaces that were both chemically cleaned (not atomically clean) and sputter cleaned (much closer to atomically clean), since such measurements are more relevant to recent indirect measurements. In addition to IIEE measurements, X-ray and ultraviolet photoelectron spectroscopies (XPS and UPS) were utilized to better understand the results.« less

Contact Activation of Blood Plasma and Factor XII by Ion-exchange Resins

PubMed Central

Yeh, Chyi-Huey Josh; Dimachkie, Ziad O.; Golas, Avantika; Cheng, Alice; Parhi, Purnendu; Vogler, Erwin A.

2011-01-01

Sepharose ion-exchange particles bearing strong Lewis acid/base functional groups (sulfopropyl, carboxymethyl, quarternary ammonium, dimethyl aminoethyl, and iminodiacetic acid) exhibiting high plasma protein adsorbent capacities are shown to be more efficient activators of blood factor XII in neat-buffer solution than either hydrophilic clean-glass particles or hydrophobic octyl sepharose particles ( FXII→surfaceactivatorFXIIa; a.k.a autoactivation, where FXII is the zymogen and FXIIa is a procoagulant protease). In sharp contrast to the clean-glass standard of comparison, ion-exchange activators are shown to be inefficient activators of blood plasma coagulation. These contrasting activation properties are proposed to be due to the moderating effect of plasma-protein adsorption on plasma coagulation. Efficient adsorption of blood plasma proteins unrelated to the coagulation cascade impedes FXII contacts with ion-exchange particles immersed in plasma, reducing autoactivation, and causing sluggish plasma coagulation. By contrast, plasma proteins do not adsorb to hydrophilic clean glass and efficient autoactivation leads directly to efficient activation of plasma coagulation. It is also shown that competitive-protein adsorption can displace FXIIa adsorbed to the surface of ion-exchange resins. As a consequence of highly-efficient autoactivation and FXIIa displacement by plasma proteins, ion-exchange particles are slightly more efficient activators of plasma coagulation than hydrophobic octyl sepharose particles that do not bear strong Lewis acid/base surface functionalities but to which plasma proteins adsorb efficiently. Plasma proteins thus play a dual role in moderating contact activation of the plasma coagulation cascade. The principal role is impeding FXII contact with activating surfaces but this same effect can displace FXIIa from an activating surface into solution where the protease can potentiate subsequent steps of the plasma coagulation cascade. PMID:21982294

Enhanced oxidation of naphthalene using plasma activation of TiO2/diatomite catalyst.

PubMed

Wu, Zuliang; Zhu, Zhoubin; Hao, Xiaodong; Zhou, Weili; Han, Jingyi; Tang, Xiujuan; Yao, Shuiliang; Zhang, Xuming

2018-04-05

Non-thermal plasma technology has great potential in reducing polycyclic aromatic hydrocarbons (PAHs) emission. But in plasma-alone process, various undesired by-products are produced, which causes secondary pollutions. Here, a dielectric barrier discharge (DBD) reactor has been developed for the oxidation of naphthalene over a TiO 2 /diatomite catalyst at low temperature. In comparison to plasma-alone process, the combination of plasma and TiO 2 /diatomite catalyst significantly enhanced naphthalene conversion (up to 40%) and CO x selectivity (up to 92%), and substantially reduced the formation of aerosol (up to 90%) and secondary volatile organic compounds (up to near 100%). The mechanistic study suggested that the presence of the TiO 2 /diatomite catalyst intensified the electron energy in the DBD. Meantime, the energized electrons generated in the discharge activated TiO 2 , while the presence of ozone enhanced the activity of the TiO 2 /diatomite catalyst. This plasma-catalyst interaction led to the synergetic effect resulting from the combination of plasma and TiO 2 /diatomite catalyst, consequently enhanced the oxidation of naphthalene. Importantly, we have demonstrated the effectiveness of plasma to activate the photocatalyst for the deep oxidation of PAH without external heating, which is potentially valuable in the development of cost-effective gas cleaning process for the removal of PAHs in vehicle applications during cold start conditions. Copyright © 2017 Elsevier B.V. All rights reserved.

Cleaning Carbon Nanotubes by Use of Mild Oxygen Plasmas

NASA Technical Reports Server (NTRS)

Petkov, Mihail

2006-01-01

Experiments have shown that it is feasible to use oxygen radicals (specifically, monatomic oxygen) from mild oxygen plasmas to remove organic contaminants and chemical fabrication residues from the surfaces of carbon nanotubes (CNTs) and metal/CNT interfaces. A capability for such cleaning is essential to the manufacture of reproducible CNT-based electronic devices. The use of oxygen radicals to clean surfaces of other materials is fairly well established. However, previously, cleaning of CNTs and of graphite by use of oxygen plasmas had not been attempted because both of these forms of carbon were known to be vulnerable to destruction by oxygen plasmas. The key to success of the present technique is, apparently, to ensure that the plasma is mild . that is to say, that the kinetic and internal energies of the oxygen radicals in the plasma are as low as possible. The plasma oxygen-radical source used in the experiments was a commercial one marketed for use in removing hydrocarbons and other organic contaminants from vacuum systems and from electron microscopes and other objects placed inside vacuum systems. In use, the source is installed in a vacuum system and air is leaked into the system at such a rate as to maintain a background pressure of .0.56 torr (.75 Pa). In the source, oxygen from the air is decomposed into monatomic oxygen by radio-frequency excitation of a resonance of the O2 molecule (N2 is not affected). Hence, what is produced is a mild (non-energetic) oxygen plasma. The oxygen radicals are transported along with the air molecules in the flow created by the vacuum pump. In the experiments, exposure to the oxygen plasma in this system was shown to remove organic contaminants and chemical fabrication residues from several specimens. Many high-magnification scanning electron microscope (SEM) images of CNTs were taken before and after exposure to the oxygen plasma. As in the example shown in the figure, none of these images showed evidence of degradation of CNT structures.

Structure of conducting channel of lightning

DOE Office of Scientific and Technical Information (OSTI.GOV)

Alanakyan, Yu. R.

2013-08-15

The spatial distribution of the plasma density in a lightning channel is studied theoretically. It is shown that the electric-field double layer is formed at the channel boundary. In this case, the electron temperature changes abruptly and ions are accelerated by the electric field of the double layer. The ion momentum flux density is close to the surrounding gas pressure. Cleaning of the channel from heavy particles occurs in particle-exchange processes between the plasma channel and the surrounding air. Hydrogen ions are accumulated inside the expanding channel from the surrounding air, which is enriched by hydrogen-contained molecules. In this case,more » the plasma channel is unstable and splits to a chain of equidistant bunches of plasma. The hydrogen-enrich bunches burn diffusely after recombination exhibiting the bead lightning behavior.« less

Surface electronic states of low-temperature H-plasma-exposed Ge(100)

NASA Astrophysics Data System (ADS)

Cho, Jaewon; Nemanich, R. J.

1992-11-01

The surface of low-temperature H-plasma-cleaned Ge(100) was studied by angle-resolved UV-photoemission spectroscopy and low-energy electron diffraction (LEED). The surface was prepared by an ex situ preclean followed by an in situ H-plasma exposure at a substrate temperature of 150-300 °C. Auger-electron spectroscopy indicated that the in situ H-plasma clean removed the surface contaminants (carbon and oxygen) from the Ge(100) surface. The LEED pattern varied from a 1×1 to a sharp 2×1, as the substrate temperature was increased. The H-induced surface state was identified at ~5.6 eV below EF, which was believed to be mainly due to the ordered or disordered monohydride phases. The annealing dependence of the spectra showed that the hydride started to dissociate at a temperature of 190 °C, and the dangling-bond surface state was identified. A spectral shift upon annealing indicated that the H-terminated surfaces were unpinned. After the H-plasma clean at 300 °C the dangling-bond surface state was also observed directly with no evidence of H-induced states.

No positive effect of Acid etching or plasma cleaning on osseointegration of titanium implants in a canine femoral condyle press-fit model.

PubMed

Saksø, H; Jakobsen, T; Saksø, M; Baas, J; Jakobsen, Ss; Soballe, K

2013-01-01

Implant surface treatments that improve early osseointegration may prove useful in long-term survival of uncemented implants. We investigated Acid Etching and Plasma Cleaning on titanium implants. In a randomized, paired animal study, four porous coated Ti implants were inserted into the femurs of each of ten dogs. PC (Porous Coating; control)PC+PSHA (Plasma Sprayed Hydroxyapatite; positive control)PC+ET (Acid Etch)PC+ET+PLCN (Plasma Cleaning) After four weeks mechanical fixation was evaluated by push-out test and osseointegration by histomorphometry. The PSHA-coated implants were better osseointegrated than the three other groups on outer surface implant porosity (p<0.05) while there was no statistical difference in deep surface implant porosity when compared with nontreated implant. Within the deep surface implant porosity, there was more newly formed bone in the control group compared to the ET and ET+PCLN groups (p<0.05). In all compared groups, there was no statistical difference in any biomechanical parameter. In terms of osseointegration on outer surface implant porosity PC+PSHA was superior to the other three groups. Neither the acid etching nor the plasma cleaning offered any advantage in terms of implant osseointegration. There was no statistical difference in any of the biomechanical parameters among all groups in the press-fit model at 4 weeks of evaluation time.

Electrolytic Plasma Processing for Sequential Cleaning and Coating Deposition for Cadmium Plating Replacement

DTIC Science & Technology

2008-08-01

deposit Al coatings or ZnAl alloys from aqueous solution. Unfortunately this proved impossible, producing only Al hydroxides and oxides, which are... deposited by normal aqueous electroplating methods. A great deal of effort was expended on attempts to produce metallic Al alloys , but no satisfactory... process . If an Al -bearing salt were soluble in a non- aqueous fluid that did not need an enclosure, then it might be possible to deposit Al coatings

Characterization of Low Pressure Cold Plasma in the Cleaning of Contaminated Surfaces

NASA Technical Reports Server (NTRS)

Lanz, Devin Garrett; Hintze, Paul E.

2016-01-01

The characterization of low pressure cold plasma is a broad topic which would benefit many different applications involving such plasma. The characterization described in this paper focuses on cold plasma used as a medium in cleaning and disinfection applications. Optical Emission Spectroscopy (OES) and Mass Spectrometry (MS) are the two analytical methods used in this paper to characterize the plasma. OES analyzes molecules in the plasma phase by displaying the light emitted by the plasma molecules on a graph of wavelength vs. intensity. OES was most useful in identifying species which may interact with other molecules in the plasma, such as atomic oxygen or hydroxide radicals. Extracting useful data from the MS is done by filtering out the peaks generated by expected molecules and looking for peaks caused by foreign ones leaving the plasma chamber. This paper describes the efforts at setting up and testing these methods in order to accurately and effectively characterize the plasma.

Plasma cleaning of beamline optical components: Contamination and gas composition effects

NASA Astrophysics Data System (ADS)

Rosenberg, Richard A.; Smith, James A.; Wallace, Daniel J.

1992-01-01

We have initiated a program to study the impact of gas composition on the carbon removal rate during plasma cleaning of optical components, and of possible contamination due to the plasma processing. The measurements were performed in a test chamber designed to simulate the geometry of the grating/Codling mirror section of a Grasshopper monochromator. Removal rates were determined for a direct-current (dc) (Al electrode) discharge using a quartz crystal microbalance coated with polymethylmethacrylate, located at the position of the grating. Auger electron spectroscopy analysis of strateg- ically located, gold-coated stainless steel samples was employed to determine contamination. The relative removal rates of the gases studied were 3% C2F6/O2≫ O2+H2O≳O2˜N2O≳H2≳N2. Although the C2F6/O2 gas mixture showed a 20 times greater removal rate than its nearest competitor, it also caused significant contamination to occur. Contamination studies were performed for both dc and radio-frequency (rf) discharges. For the dc discharge we found that great care must be taken in order to avoid Al contamination; for the rf discharge, significant Fe contamination was observed.

Improved Si0.5Ge0.5/Si interface quality achieved by the process of low energy hydrogen plasma cleaning and investigation of interface quality with positron annihilation spectroscopy

NASA Astrophysics Data System (ADS)

Liao, M.-H.; Chen, C.-H.

2013-04-01

The Positron Annihilation Spectra (PAS), Raman, and Photoluminescence spectroscopy reveal that Si0.5Ge0.5/Si interface quality can be significantly improved by the low energy plasma cleaning process using hydrogen. In the PAS, the particularly small value of lifetime and intensity near the Si0.5Ge0.5/Si interface in the sample with the treatment indicate that the defect concentration is successfully reduced 2.25 times, respectively. Fewer defects existed in the Si0.5Ge0.5/Si interface result in the high compressive strain about 0.36% in the top epi-Si0.5Ge0.5 layer, which can be observed in Raman spectra and stronger radiative recombination rate about 1.39 times for the infrared emission, which can be observed in the photoluminescence spectra. With better Si0.5Ge0.5/Si interface quality, the SiGe-based devices can have better optical and electrical characteristics for more applications in the industry. The PAS is also demonstrated that it is the useful methodology tool to quantify the defect information in the SiGe-based material.

Trial of a novel plasma gas disinfection system (Radica) to reduce mattress residual bacterial contamination in the acute hospital setting: a preliminary study.

PubMed

Shiely, F; Fallon, D; Casey, C; Kerins, D M; Eustace, J A

2017-02-01

In routine clinical practice, mattresses are manually cleaned using specialised cleaning and high-level disinfecting fluids. While effective against a wide range of organisms, the success of this approach is dependent on a thorough and complete application and is likely to be susceptible to human error and thus variable. The efficacy of available infection control measures to reduce such mattress contamination is unknown as it is not subject to quality control measures. There is a pressing need to identify more effective methods to prevent cross contamination within the medical environment, given the lack of available treatment strategies. The purpose of this study is to investigate the ability of a new technology, gaseous technology, to reduce colonization levels, compared to standard cleaning, and so attenuate superficial nosocomial infections. We conducted a prospective, single-centre, open-label, non-randomized trial with blinded outcome assessments, comparing the standard cleaning of hospital mattresses with a novel plasma based disinfection system Radica™, followed by a standard post-cleaning culturing protocol (five swabs/mattress). The median (interquartile range) maximal colony count per mattress for the 20 Radica versus 7 routinely cleaned mattresses was 1 (1-2.7) versus Too-Numerous-to-Count (TNTC) (32-TNTC), respectively, p = 0.002. Of the 20 Radica™ treated mattresses, 12 (60 %) had no positive culture result while all of the standard cleaned mattresses had at least two positive cultures. The plasma based Radica disinfection system reduces mattress bacterial colonization levels as compared to routine cleaning. This is a potentially important technology in the health care system to reduce surface colonisation and hence nosocomial infections.

Cleaning of inner vacuum surfaces in the Uragan-3M facility by radio-frequency discharges

DOE Office of Scientific and Technical Information (OSTI.GOV)

Lozin, A. V., E-mail: alexlozin@meta.ua; Moiseenko, V. E.; Grigor’eva, L. I.

2013-08-15

A method for cleaning vacuum surfaces by a low-temperature (T{sub e} ∼ 10 eV) relatively dense (n{sub e} ≈ 10{sup 12} cm{sup −3}) plasma of an RF discharge was developed and successfully applied at the Uragan-3M torsatron. The convenience of the method is that it can be implemented with the same antenna system and RF generators that are used to produce and heat the plasma in the operating mode and does not require retuning the frequencies of the antennas and RF generators. The RF discharge has a high efficiency from the standpoint of cleaning vacuum surfaces. After performing a seriesmore » of cleanings by the low-temperature RF discharge plasma (about 20000 pulses), (i) the intensity of the CIII impurity line was substantially reduced, (ii) a quasi-steady operating mode with a duration of up to 50 ms, a plasma density of n{sub e} ≈ 10{sup 12} cm{sup −3}, and an electron temperature of up to T{sub e} ∼ 1 keV was achieved, and (iii) mass spectrometric analysis of the residual gas in the chamber indicated a significant reduction in the impurity content.« less

Tuning the adhesion between polyimide substrate and MWCNTs/epoxy nanocomposite by surface treatment

NASA Astrophysics Data System (ADS)

Bouhamed, Ayda; Kia, Alireza Mohammadian; Naifar, Slim; Dzhagan, Volodymyr; Müller, Christian; Zahn, Dietrich R. T.; Choura, Slim; Kanoun, Olfa

2017-11-01

MWCNTs/epoxy nanocomposite thin films are coated on the polyimide (PI) flexible substrate, to be used as a strain sensor. Previous studies showed that the adhesion between polyimide and other materials are very poor. In this work, two approaches, oxygen plasma cleaning and simple solvent cleaning are performed for activation of the polyimide surface. In order to understand the impact of both cleaning techniques, the physicochemical properties of PI are measured and characterized using contact angle measurements (CAMs), X-ray photoelectron spectroscopy(XPS), and atomic force microscopy (AFM). In addition, the adhesion properties of PI/[MWCNTs/epoxy] systems by varying surface treatment time are investigated and evaluated using force-distance measurements by AFM. The results illustrate that the activated surface exhibits higher surface energy for oxygen plasma cleaning in comparison with the solvent cleaning method. The improvement can be related to the increase of oxygen concentration, which is accompanied by the enhancement of the polar component to 53.79 mN/m due to the formation of functional groups on the surface and the change of the substrate surface roughness from 1.72 nm to 15.5 nm. As a result, improved adhesion was observed from force-distance measurement between PI/[MWCNTs/epoxy] systems due to oxygen plasma effects.

Contamination mitigation strategies for scanning transmission electron microscopy.

PubMed

Mitchell, D R G

2015-06-01

Modern scanning transmission electron microscopy (STEM) enables imaging and microanalysis at very high magnification. In the case of aberration-corrected STEM, atomic resolution is readily achieved. However, the electron fluxes used may be up to three orders of magnitude greater than those typically employed in conventional STEM. Since specimen contamination often increases with electron flux, specimen cleanliness is a critical factor in obtaining meaningful data when carrying out high magnification STEM. A range of different specimen cleaning methods have been applied to a variety of specimen types. The contamination rate has been measured quantitatively to assess the effectiveness of cleaning. The methods studied include: baking, cooling, plasma cleaning, beam showering and UV/ozone exposure. Of the methods tested, beam showering is rapid, experimentally convenient and very effective on a wide range of specimens. Oxidative plasma cleaning is also very effective and can be applied to specimens on carbon support films, albeit with some care. For electron beam-sensitive materials, cooling may be the method of choice. In most cases, preliminary removal of the bulk of the contamination by methods such as baking or plasma cleaning, followed by beam showering, where necessary, can result in a contamination-free specimen suitable for extended atomic scale imaging and analysis. Copyright © 2015 Elsevier Ltd. All rights reserved.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Rodenbeck, Christopher T; Girardi, Michael

Internal nodes of a constituent integrated circuit (IC) package of a multichip module (MCM) are protected from excessive charge during plasma cleaning of the MCM. The protected nodes are coupled to an internal common node of the IC package by respectively associated discharge paths. The common node is connected to a bond pad of the IC package. During MCM assembly, and before plasma cleaning, this bond pad receives a wire bond to a ground bond pad on the MCM substrate.

Patterning of graphene for flexible electronics with remote atmospheric-pressure plasma using dielectric barrier

NASA Astrophysics Data System (ADS)

Kim, Duk Jae; Park, Jeongwon; Geon Han, Jeon

2016-08-01

We show results of the patterning of graphene layers on poly(ethylene terephthalate) (PET) films through remote atmospheric-pressure dielectric barrier discharge plasma. The size of plasma discharge electrodes was adjusted for large-area and role-to-role-type substrates. Optical emission spectroscopy (OES) was used to analyze the characteristics of charge species in atmospheric-pressure plasma. The OES emission intensity of the O2* peaks (248.8 and 259.3 nm) shows the highest value at the ratio of \\text{N}2:\\text{clean dry air (CDA)} = 100:1 due to the highest plasma discharge. The PET surface roughness and hydrophilic behavior were controlled with CDA flow rate during the process. Although the atmospheric-pressure plasma treatment of the PET film led to an increase in the FT-IR intensity of C-O bonding at 1240 cm-1, the peak intensity at 1710 cm-1 (C=O bonding) decreased. The patterning of graphene layers was confirmed by scanning electron microscopy and Raman spectroscopy.

Removal of Tin from Extreme Ultraviolet Collector Optics by an In-Situ Hydrogen Plasma

NASA Astrophysics Data System (ADS)

Elg, Daniel Tyler

Throughout the 1980s and 1990s, as the semiconductor industry upheld Moore's Law and continuously shrank device feature sizes, the wavelength of the lithography source remained at or below the resolution limit of the minimum feature size. Since 2001, however, the light source has been the 193nm ArF excimer laser. While the industry has managed to keep up with Moore's Law, shrinking feature sizes without shrinking the lithographic wavelength has required extra innovations and steps that increase fabrication time, cost, and error. These innovations include immersion lithography and double patterning. Currently, the industry is at the 14 nm technology node. Thus, the minimum feature size is an order of magnitude below the exposure wavelength. For the 10 nm node, triple and quadruple patterning have been proposed, causing potentially even more cost, fabrication time, and error. Such a trend cannot continue indefinitely in an economic fashion, and it is desirable to decrease the wavelength of the lithography sources. Thus, much research has been invested in extreme ultraviolet lithography (EUVL), which uses 13.5 nm light. While much progress has been made in recent years, some challenges must still be solved in order to yield a throughput high enough for EUVL to be commercially viable for high-volume manufacturing (HVM). One of these problems is collector contamination. Due to the 92 eV energy of a 13.5 nm photon, EUV light must be made by a plasma, rather than by a laser. Specifically, the industrially-favored EUV source topology is to irradiate a droplet of molten Sn with a laser, creating a dense, hot laser-produced plasma (LPP) and ionizing the Sn to (on average) the +10 state. Additionally, no materials are known to easily transmit EUV. All EUV light must be collected by a collector optic mirror, which cannot be guarded by a window. The plasmas used in EUV lithography sources expel Sn ions and neutrals, which degrade the quality of collector optics. The mitigation of this debris is one of the main problems facing potential manufacturers of EUV sources. which can damage the collector optic in three ways: sputtering, implantation, and deposition. The first two damage processes are irreversible and are caused by the high energies (1-10 keV) of the ion debris. Debris mitigation methods have largely managed to reduce this problem by using collisions with H2 buffer gas to slow down the energetic ions. However, deposition can take place at all ion and neutral energies, and no mitigation method can deterministically deflect all neutrals away from the collector. Thus, deposition still takes place, lowering the collector reflectivity and increasing the time needed to deliver enough EUV power to pattern a wafer. Additionally, even once EUV reaches HVM insertion, source power will need to be continually increased as feature sizes continue to shrink; this increase in source power may potentially come at a cost of increased debris. Thus, debris mitigation solutions that work for the initial generation of commercial EUVL systems may not be adequate for future generations. An in-situ technology to clean collector optics without source downtime is required. which will require an in-situ technology to clean collector optics. The novel cleaning solution described in this work is to create the radicals directly on the collector surface by using the collector itself to drive a capacitively-coupled hydrogen plasma. This allows for radical creation at the desired location without requiring any delivery system and without requiring any source downtime. Additionally, the plasma provides energetic radicals that aid in the etching process. This work will focus on two areas. First, it will focus on experimental collector cleaning and EUV reflectivity restoration. Second, it will focus on developing an understanding of the fundamental processes governing Sn removal. It will be shown that this plasma technique can clean an entire collector optic and restore EUV reflectivity to MLMs without damaging them. Additionally, it will be shown that, within the parameter space explored, the limiting factor in Sn etching is not hydrogen radical flux or SnH4 decomposition but ion energy flux. This will be backed up by experimental measurements, as well as a plasma chemistry model of the radical density and a 3D model of SnH4 transport and redeposition.

Large area atmospheric-pressure plasma jet

DOEpatents

Selwyn, Gary S.; Henins, Ivars; Babayan, Steve E.; Hicks, Robert F.

2001-01-01

Large area atmospheric-pressure plasma jet. A plasma discharge that can be operated at atmospheric pressure and near room temperature using 13.56 MHz rf power is described. Unlike plasma torches, the discharge produces a gas-phase effluent no hotter than 250.degree. C. at an applied power of about 300 W, and shows distinct non-thermal characteristics. In the simplest design, two planar, parallel electrodes are employed to generate a plasma in the volume therebetween. A "jet" of long-lived metastable and reactive species that are capable of rapidly cleaning or etching metals and other materials is generated which extends up to 8 in. beyond the open end of the electrodes. Films and coatings may also be removed by these species. Arcing is prevented in the apparatus by using gas mixtures containing He, which limits ionization, by using high flow velocities, and by properly spacing the rf-powered electrode. Because of the atmospheric pressure operation, there is a negligible density of ions surviving for a sufficiently long distance beyond the active plasma discharge to bombard a workpiece, unlike the situation for low-pressure plasma sources and conventional plasma processing methods.

Atmospheric-pressure plasma jet

DOEpatents

Selwyn, Gary S.

1999-01-01

Atmospheric-pressure plasma jet. A .gamma.-mode, resonant-cavity plasma discharge that can be operated at atmospheric pressure and near room temperature using 13.56 MHz rf power is described. Unlike plasma torches, the discharge produces a gas-phase effluent no hotter than 250.degree. C. at an applied power of about 300 W, and shows distinct non-thermal characteristics. In the simplest design, two concentric cylindrical electrodes are employed to generate a plasma in the annular region therebetween. A "jet" of long-lived metastable and reactive species that are capable of rapidly cleaning or etching metals and other materials is generated which extends up to 8 in. beyond the open end of the electrodes. Films and coatings may also be removed by these species. Arcing is prevented in the apparatus by using gas mixtures containing He, which limits ionization, by using high flow velocities, and by properly shaping the rf-powered electrode. Because of the atmospheric pressure operation, no ions survive for a sufficiently long distance beyond the active plasma discharge to bombard a workpiece, unlike low-pressure plasma sources and conventional plasma processing methods.

Plasma combined self-assembled monolayer pretreatment on electroplated-Cu surface for low temperature Cu-Sn bonding in 3D integration

NASA Astrophysics Data System (ADS)

Wang, Junqiang; Wang, Qian; Wu, Zijian; Tan, Lin; Cai, Jian; Wang, Dejun

2017-05-01

A novel pretreatment of plasma combined self-assembled monolayer (PcSAM) was proposed to improve surface properties of electroplated Cu for low temperature Cu-Sn bonding in 3D integration. Measurement results revealed that self-assemble monolayer (SAM) would be easier absorbed on plasma-activated Cu surface and protect the clean surface from re-oxidation when storage. The absorbed SAM layer could be removed by thermal desorption during bonding process. With optimal PcSAM pretreatment, oxygen content of the Cu surface was reduced to as low as 1.39%. The followed Cu-Sn bonding was realized at low temperature of 200 °C. Finally, bonding interface exhibited a defect-free interconnection, and bonding strength has reached as high as 68.7 MPa.

FY 2017 Center Innovation Fund Annual Report - Highlights/Abstract section

NASA Technical Reports Server (NTRS)

Hintze, Paul; Youngquist, Robert C.; Massa, Gioia D.; Meier, Anne J.

2017-01-01

This project evaluated the feasibility of low pressure cold plasma (CP) for two applications: disinfection of produce grown in space and sterilization of medical equipment in space. Currently there is no ISS capability for disinfecting pick and eat crops, food utensils, food production areas, or medical devices. This deficit is extended to projected long duration missions. Small, portable, cold plasma devices would provide an enhanced benefit to crew health and address issues concerning microbial cross contamination. The technology would contribute to the reduction of solid waste since currently crews utilize benzalkonium chloride wet wipes for cleaning surfaces and might use PRO-SAN wipes for cleaning vegetables. CP cleaning/disinfection/sterilization can work on many surfaces, including all metals, most polymers, and this project evaluated produce. Therefore CP provides a simple system that has many different cleaning application in space: produce, medical equipment, cutlery, miscellaneous tools.

The study of low temperature plasma of pulse discharge in relation to air cleaning units.

NASA Astrophysics Data System (ADS)

Ponizovskiy, A.; Gosteev, S.; Kuzhel, O.

2017-11-01

In paper it studied parameters of low-temperature plasma (LTP) used in systems for cleaning waste gas. LTP created by positive nanosecond corona discharges, generated by high voltage pulses with a rise time of 50 ns, duration up to 400 ns, an amplitude up to 90 kV and pulses repetition 50-1000 Hz. in coaxial electrode system with gap space 3-10 cm through which moving air with linear velocity v = 0.01 to 10 m/s.

Reduction of Trapped-Ion Anomalous Heating by in situ Surface Plasma Cleaning

DTIC Science & Technology

2015-04-29

the trap chip temperature. To load ions, we initially cool 88Sr atoms into a remotely-located magneto - optical trap (MOT), then use a resonant push beam... trap heating rates [10]. Furthermore, some previous experiments have shown an improvement in the heating rates of surface-electrode ion traps after...rate when the trap chip is held at 4 K is not significantly improved by the plasma cleaning. While the observed frequency scaling is not the same in

Evaluation of Low-Pressure Cold Plasma for Disinfection of ISS Grown Produce and Metal Instruments

NASA Technical Reports Server (NTRS)

Hummerick, Mary E.; Hintze, Paul E.; Maloney, Philip R.; Spencer, Lashelle E.; Coutts, Janelle L.; Franco, Carolina

2016-01-01

Low pressure cold plasma, using breathing air as the plasma gas, has been shown to be effective at precision cleaning aerospace hardware at Kennedy Space Center.Both atmospheric and low pressure plasmas are relatively new technologies being investigated for disinfecting agricultural commodities and medical instruments.

Radio-Frequency Plasma Cleaning of a Penning Malmberg Trap

NASA Technical Reports Server (NTRS)

Sims, William Herbert, III; Martin, James; Pearson, J. Boise; Lewis, Raymond

2005-01-01

Radio-frequency-generated plasma has been demonstrated to be a promising means of cleaning the interior surfaces of a Penning-Malmberg trap that is used in experiments on the confinement of antimatter. {Such a trap was reported in Modified Penning-Malmberg Trap for Storing Antiprotons (MFS-31780), NASA Tech Briefs, Vol. 29, No. 3 (March 2005), page 66.} Cleaning of the interior surfaces is necessary to minimize numbers of contaminant atoms and molecules, which reduce confinement times by engaging in matter/antimatter-annihilation reactions with confined antimatter particles. A modified Penning-Malmberg trap like the one described in the cited prior article includes several collinear ring electrodes (some of which are segmented) inside a tubular vacuum chamber, as illustrated in Figure 1. During operation of the trap, a small cloud of charged antiparticles (e.g., antiprotons or positrons) is confined to a spheroidal central region by means of a magnetic field in combination with DC and radiofrequency (RF) electric fields applied via the electrodes. In the present developmental method of cleaning by use of RF-generated plasma, one evacuates the vacuum chamber, backfills the chamber with hydrogen at a suitable low pressure, and uses an RF-signal generator and baluns to apply RF voltages to the ring electrodes. Each ring is excited in the polarity opposite that of the adjacent ring. The electric field generated by the RF signal creates a discharge in the low-pressure gas. The RF power and gas pressure are adjusted so that the plasma generated in the discharge (see Figure 2) physically and chemically attacks any solid, liquid, and gaseous contaminant layers on the electrode surfaces. The products of the physical and chemical cleaning reactions are gaseous and are removed by the vacuum pumps.

Harnessing of radio frequency discharge for production of biologically compatible coatings for ophthalmology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Abdullin, I.Sh.; Bragin, V.E.; Bykanov, A.N.

Gas discharge plasma modification of polymer materials and metals is one of the known physical approaches for improving of materials biocompatibility in ophthalmology and surgery. The surface treatment in RF discharges can be effectively realized in the discharge afterglow and in the discharge region itself too. This modification method is more convenient and produces more uniform surfaces in comparison with other discharge types. The carried out experiments and published up to now results show that interaction of UV radiation, fluxes of ions, electrons and metastable particles with material`s surface changes chemical composition and surface structure. The exerting of these agentsmore » on the sample surface produces the following effects. There are processes of physical and plasma-chemical surface etching producing effective surface cleaning of different types of contaminations. It may be surface contaminations by hydrocarbons because of preliminary surface contacts with biological or physical bodies. It may be surface contaminations caused by characteristic properties of chemical technology too. There is a surface layer with thickness from some angstroms up to few hundreds of angstroms. The chemical content and structure of this layer is distinguished from the bulk polymer properties. The presence of such {open_quotes}technological{close_quotes} contaminations produces the layer of material substantially differing from the base polymer. The basic layer physical and chemical properties for example, gas permeation rate may substantially differ from the base polymer. Attempts to clean the surface from these contaminations by chemical methods (solutions) have not been successful and produced contaminations of more deep polymer layers. So the plasma cleaning is the most profitable method of polymer treatment for removing the surface contaminations. The improving of wettability occurs during this stage of treatment.« less

Plasma Surface Interactions Common to Advanced Fusion Wall Materials and EUV Lithography - Lithium and Tin

NASA Astrophysics Data System (ADS)

Ruzic, D. N.; Alman, D. A.; Jurczyk, B. E.; Stubbers, R.; Coventry, M. D.; Neumann, M. J.; Olczak, W.; Qiu, H.

2004-09-01

Advanced plasma facing components (PFCs) are needed to protect walls in future high power fusion devices. In the semiconductor industry, extreme ultraviolet (EUV) sources are needed for next generation lithography. Lithium and tin are candidate materials in both areas, with liquid Li and Sn plasma material interactions being critical. The Plasma Material Interaction Group at the University of Illinois is leveraging liquid metal experimental and computational facilities to benefit both fields. The Ion surface InterAction eXperiment (IIAX) has measured liquid Li and Sn sputtering, showing an enhancement in erosion with temperature for light ion bombardment. Surface Cleaning of Optics by Plasma Exposure (SCOPE) measures erosion and damage of EUV mirror samples, and tests cleaning recipes with a helicon plasma. The Flowing LIquid surface Retention Experiment (FLIRE) measures the He and H retention in flowing liquid metals, with retention coefficients varying between 0.001 at 500 eV to 0.01 at 4000 eV.

Selective deposition for ''chamber clean-free'' processes using tailored voltage waveform plasmas

NASA Astrophysics Data System (ADS)

Wang, Junkang; v. Johnson, Erik

2016-09-01

Tailored Voltage Waveforms (TVWs) have been proven capable of creating plasma asymmetries in otherwise symmetric CCP reactors. Particularly, sawtooth TVWs (described as having strong slope-asymmetry due to different voltage rise/fall slope) can lead to different sheath dynamics, thus generating strongly asymmetric ionization near each electrode. To date, research concerning the slope-asymmetry has only focused on single-gas plasmas. Herein, we present a study looking at SiF4/H2/Ar mixtures to investigate silicon thin film deposition. The resulting surface process depends strongly on multiple precursors, and the deposition requires a specific balance between surface arrival rates of SiFx and H. For a certain gas flow ratio, we can obtain a deposition rate of 0.82Å/s on one electrode and an etching rate of 1.2Å/s on the other. Moreover, the deposition/etching balance can be controlled by H2 flow and waveform amplitude. This is uniquely possible due to the mixed-gas nature of the process and localized ionization generated by sawtooth TVWs. This encourages the prospect that one could choose process conditions to achieve a variety of desired depositions on one electrode, while leaving the other pristine.

Hydrophobic and superhydrophobic surfaces fabricated using atmospheric pressure cold plasma technology: A review.

PubMed

Dimitrakellis, Panagiotis; Gogolides, Evangelos

2018-04-01

Hydrophobic surfaces are often used to reduce wetting of surfaces by water. In particular, superhydrophobic surfaces are highly desired for several applications due to their exceptional properties such as self-cleaning, anti-icing, anti-friction and others. Such surfaces can be prepared via numerous methods including plasma technology, a dry technique with low environmental impact. Atmospheric pressure plasma (APP) has recently attracted significant attention as lower-cost alternative to low-pressure plasmas, and as a candidate for continuous rather than batch processing. Although there are many reviews on water-repellent surfaces, and a few reviews on APP technology, there are hardly any review works on APP processing for hydrophobic and superhydrohobic surface fabrication, a topic of high importance in nanotechnology and interface science. Herein, we critically review the advances on hydrophobic and superhydrophobic surface fabrication using APP technology, trying also to give some perspectives in the field. After a short introduction to superhydrophobicity of nanostructured surfaces and to APPs we focus this review on three different aspects: (1) The atmospheric plasma reactor technology used for fabrication of (super)hydrophobic surfaces. (2) The APP process for hydrophobic surface preparation. The hydrophobic surface preparation processes are categorized methodologically as: a) activation, b) grafting, c) polymerization, d) roughening and hydrophobization. Each category includes subcategories related to different precursors used. (3) One of the most important sections of this review concerns superhydrophobic surfaces fabricated using APP. These are methodologically characterized as follows: a) single step processes where micro-nano textured topography and low surface energy coating are created at the same time, or b) multiple step processes, where these steps occur sequentially in or out of the plasma. We end the review with some perspectives in the field. We aspire to address scientists, who will get involved in the fields of (super)hydrophobicity and/or in atmospheric pressure plasma processing. Copyright © 2018 Elsevier B.V. All rights reserved.

Production of organic compounds in plasmas: A comparison among electric sparks, laser-induced plasmas and UV light

NASA Technical Reports Server (NTRS)

Scattergood, T. W.; Mckay, C. P.; Borucki, W. J.; Giver, L. P.; Vanghyseghem, H.; Parris, J. E.; Miller, S. L.

1991-01-01

In order to study the production of organic compounds in plasmas (and shocks), various mixtures of N2, CH4, and H2, modeling the atmosphere of Titan, were exposed to discrete sparks, laser-induced plasmas (LIP) and ultraviolet light. The yields of HCN and simple hydrocarbons were measured and compared to those calculated from a simple quenched thermodynamic equilibrium model. The agreement between experiment and theory was fair for HCN and C2H2. However, the yields of C2H6 and other hydrocarbons were much higher than those predicted by the model. Our experiments suggest that photolysis by ultraviolet light from the plasma is an important process in the synthesis. This was confirmed by the photolysis of gas samples exposed to the light, but not to the plasma or shock waves. The results of these experiments demonstrate that, in addition to the well-known efficient synthesis of organic compounds in plasmas, the yields of saturated species, e.g., ethane, may be higher than predicted by theory and that LIP provide a convenient and clean way of simulating planetary lightning and impact plasmas in the laboratory.

Investigation of the boundary layer during the transition from volume to surface dominated H- production at the BATMAN test facility

NASA Astrophysics Data System (ADS)

Wimmer, C.; Schiesko, L.; Fantz, U.

2016-02-01

BATMAN (Bavarian Test Machine for Negative ions) is a test facility equipped with a 1/8 scale H- source for the ITER heating neutral beam injection. Several diagnostics in the boundary layer close to the plasma grid (first grid of the accelerator system) followed the transition from volume to surface dominated H- production starting with a Cs-free, cleaned source and subsequent evaporation of caesium, while the source has been operated at ITER relevant pressure of 0.3 Pa: Langmuir probes are used to determine the plasma potential, optical emission spectroscopy is used to follow the caesiation process, and cavity ring-down spectroscopy allows for the measurement of the H- density. The influence on the plasma during the transition from an electron-ion plasma towards an ion-ion plasma, in which negative hydrogen ions become the dominant negatively charged particle species, is seen in a strong increase of the H- density combined with a reduction of the plasma potential. A clear correlation of the extracted current densities (jH-, je) exists with the Cs emission.

Investigation of the boundary layer during the transition from volume to surface dominated H⁻ production at the BATMAN test facility.

PubMed

Wimmer, C; Schiesko, L; Fantz, U

2016-02-01

BATMAN (Bavarian Test Machine for Negative ions) is a test facility equipped with a 18 scale H(-) source for the ITER heating neutral beam injection. Several diagnostics in the boundary layer close to the plasma grid (first grid of the accelerator system) followed the transition from volume to surface dominated H(-) production starting with a Cs-free, cleaned source and subsequent evaporation of caesium, while the source has been operated at ITER relevant pressure of 0.3 Pa: Langmuir probes are used to determine the plasma potential, optical emission spectroscopy is used to follow the caesiation process, and cavity ring-down spectroscopy allows for the measurement of the H(-) density. The influence on the plasma during the transition from an electron-ion plasma towards an ion-ion plasma, in which negative hydrogen ions become the dominant negatively charged particle species, is seen in a strong increase of the H(-) density combined with a reduction of the plasma potential. A clear correlation of the extracted current densities (j(H(-)), j(e)) exists with the Cs emission.

Optimizing process and equipment efficiency using integrated methods

NASA Astrophysics Data System (ADS)

D'Elia, Michael J.; Alfonso, Ted F.

1996-09-01

The semiconductor manufacturing industry is continually riding the edge of technology as it tries to push toward higher design limits. Mature fabs must cut operating costs while increasing productivity to remain profitable and cannot justify large capital expenditures to improve productivity. Thus, they must push current tool production capabilities to cut manufacturing costs and remain viable. Working to continuously improve mature production methods requires innovation. Furthermore, testing and successful implementation of these ideas into modern production environments require both supporting technical data and commitment from those working with the process daily. At AMD, natural work groups (NWGs) composed of operators, technicians, engineers, and supervisors collaborate to foster innovative thinking and secure commitment. Recently, an AMD NWG improved equipment cycle time on the Genus tungsten silicide (WSi) deposition system. The team used total productive manufacturing (TPM) to identify areas for process improvement. Improved in-line equipment monitoring was achieved by constructing a real time overall equipment effectiveness (OEE) calculator which tracked equipment down, idle, qualification, and production times. In-line monitoring results indicated that qualification time associated with slow Inspex turn-around time and machine downtime associated with manual cleans contributed greatly to reduced availability. Qualification time was reduced by 75% by implementing a new Inspex monitor pre-staging technique. Downtime associated with manual cleans was reduced by implementing an in-situ plasma etch back to extend the time between manual cleans. A designed experiment was used to optimize the process. Time between 18 hour manual cleans has been improved from every 250 to every 1500 cycles. Moreover defect density realized a 3X improvement. Overall, the team achieved a 35% increase in tool availability. This paper details the above strategies and accomplishments.

Controlled drive-in and precipitation of hydrogen during plasma hydrogenation of silicon using a thin compressively strained SiGe layer

DOE Office of Scientific and Technical Information (OSTI.GOV)

Okba, F.; Departement Optique et Mecanique de Precision, Faculte des Sciences de l'Ingenieur, Universite Ferhat Abbas, Setif 19000; Cherkashin, N.

2010-07-19

We have quantitatively studied by transmission electron microscopy the growth kinetics of platelets formed during the continuous hydrogenation of a Si substrate/SiGe/Si heterostructure. We have evidenced and explained the massive transfer of hydrogen from a population of platelets initially generated in the upper Si layer by plasma hydrogenation towards a population of larger platelets located in the SiGe layer. We demonstrate that this type of process can be used not only to precisely localize the micro-cracks, then the fracture line at a given depth but also to 'clean' the top layer from pre-existing defects.

The unexpected confluence of plasma physics and climate science: On the lives and legacies of Norman Rostoker and Sherry Rowland

NASA Astrophysics Data System (ADS)

Mackey, Katherine R. M.

2016-03-01

The Norman Rostoker Memorial Symposium brought together approximately 150 attendees to share their recent work and to reflect on the contributions of Norman Rostoker to the field of plasma physics and the advancement of fusion as a source of renewable clean energy. The field has changed considerably in a few short decades, with theoretical advances and technological innovations evolving in lock step. Over those same decades, our understanding of human induced climate change has also evolved; measurable changes in Earth's physical, chemical, and biological processes have already been observed, and these will likely intensify in the coming decades. Never before has the need for clean energy been more pronounced, or the need for transformative solutions more pressing. As scientists work with legislators, journalists, and the public to take actions to address the threat of climate change, there is much to be learned from the legacies of innovators like Norman Rostoker, who have tackled complex problems with scientific insight and determination even when the odds were stacked against them. I write this from the perspective on an Earth system scientist who studies photosynthesis and the biogeochemistry of the oceans, and my statements about plasma physics and Norman Rostoker are based on information I gathered from the colloquium and from many enjoyable conversations with his friends and colleagues.

The unexpected confluence of plasma physics and climate science: On the lives and legacies of Norman Rostoker and Sherry Rowland

DOE Office of Scientific and Technical Information (OSTI.GOV)

Mackey, Katherine R. M.

The Norman Rostoker Memorial Symposium brought together approximately 150 attendees to share their recent work and to reflect on the contributions of Norman Rostoker to the field of plasma physics and the advancement of fusion as a source of renewable clean energy. The field has changed considerably in a few short decades, with theoretical advances and technological innovations evolving in lock step. Over those same decades, our understanding of human induced climate change has also evolved; measurable changes in Earth’s physical, chemical, and biological processes have already been observed, and these will likely intensify in the coming decades. Never beforemore » has the need for clean energy been more pronounced, or the need for transformative solutions more pressing. As scientists work with legislators, journalists, and the public to take actions to address the threat of climate change, there is much to be learned from the legacies of innovators like Norman Rostoker, who have tackled complex problems with scientific insight and determination even when the odds were stacked against them. I write this from the perspective on an Earth system scientist who studies photosynthesis and the biogeochemistry of the oceans, and my statements about plasma physics and Norman Rostoker are based on information I gathered from the colloquium and from many enjoyable conversations with his friends and colleagues.« less

Plasma cleaning of beamline optical components: Contamination and gas composition effects

DOE Office of Scientific and Technical Information (OSTI.GOV)

Rosenberg, R.A.; Smith, J.A.; Wallace, D.J.

1992-01-01

We have initiated a program to study the impact of gas composition on the carbon removal rate during plasma cleaning of optical components, and of possible contamination due to the plasma processing. The measurements were performed in a test chamber designed to simulate the geometry of the grating/Codling mirror section of a Grasshopper monochromator. Removal rates were determined for a direct-current (dc) (Al electrode) discharge using a quartz crystal microbalance coated with polymethylmethacrylate, located at the position of the grating. Auger electron spectroscopy analysis of strateg- ically located, gold-coated stainless steel samples was employed to determine contamination. The relative removalmore » rates of the gases studied were 3% C{sub 2}F{sub 6}/O{sub 2}{much gt} O{sub 2}+H{sub 2}O{gt}O{sub 2}{similar to}N{sub 2}O{gt}H{sub 2}{gt}N{sub 2}. Although the C{sub 2}F{sub 6}/O{sub 2} gas mixture showed a 20 times greater removal rate than its nearest competitor, it also caused significant contamination to occur. Contamination studies were performed for both dc and radio-frequency (rf) discharges. For the dc discharge we found that great care must be taken in order to avoid Al contamination; for the rf discharge, significant Fe contamination was observed.« less

Surface analysis of 316 stainless steel treated with cold atmospheric plasma

NASA Astrophysics Data System (ADS)

Williams, David F.; Kellar, Ewen J. C.; Jesson, David A.; Watts, John F.

2017-05-01

The surface of 316 stainless steel has been modified using cold atmospheric plasma (CAP) to increase the surface free energy (by cleaning the and chemically activating the surface)IN preparation for subsequent processes such as painting, coating or adhesive bonding. The analyses carried out, on CAP treated 316 stainless steel surfaces, includes X-ray photoelectron spectroscopy (XPS), imaging XPS (iXPS), and surface free energy (SFE) analysis using contact angle measurements. The CAP treatment is shown to increase the SFE of as-received 316 stainless steel from ∼39 mJ m-1 to >72 mJ m-1 after a short exposure to the plasma torch. This was found to correlate to a reduction in adventitious carbon, as determined by XPS analysis of the surface. The reduction from ∼90 at% to ∼30% and ∼39 at%, after being plasma treated for 5 min and 15 s respectively, shows that the process is relatively quick at changing the surface. It is suggested that the mechanism that causes the increase in surface free energy is chain scission of the hydrocarbon contamination triggered by free electrons in the plasma plume followed by chemical functionalisation of the metal oxide surface and some of the remaining carbon contamination layer.

High density plasma etching of magnetic devices

NASA Astrophysics Data System (ADS)

Jung, Kee Bum

Magnetic materials such as NiFe (permalloy) or NiFeCo are widely used in the data storage industry. Techniques for submicron patterning are required to develop next generation magnetic devices. The relative chemical inertness of most magnetic materials means they are hard to etch using conventional RIE (Reactive Ion Etching). Therefore ion milling has generally been used across the industry, but this has limitations for magnetic structures with submicron dimensions. In this dissertation, we suggest high density plasmas such as ECR (Electron Cyclotron Resonance) and ICP (Inductively Coupled Plasma) for the etching of magnetic materials (NiFe, NiFeCo, CoFeB, CoSm, CoZr) and other related materials (TaN, CrSi, FeMn), which are employed for magnetic devices like magnetoresistive random access memories (MRAM), magnetic read/write heads, magnetic sensors and microactuators. This research examined the fundamental etch mechanisms occurring in high density plasma processing of magnetic materials by measuring etch rate, surface morphology and surface stoichiometry. However, one concern with using Cl2-based plasma chemistry is the effect of residual chlorine or chlorinated etch residues remaining on the sidewalls of etched features, leading to a degradation of the magnetic properties. To avoid this problem, we employed two different processing methods. The first one is applying several different cleaning procedures, including de-ionized water rinsing or in-situ exposure to H2, O2 or SF6 plasmas. Very stable magnetic properties were achieved over a period of ˜6 months except O2 plasma treated structures, with no evidence of corrosion, provided chlorinated etch residues were removed by post-etch cleaning. The second method is using non-corrosive gas chemistries such as CO/NH3 or CO2/NH3. There is a small chemical contribution to the etch mechanism (i.e. formation of metal carbonyls) as determined by a comparison with Ar and N2 physical sputtering. The discharge should be NH3-rich to achieve the highest etch rates. Several different mask materials were investigated, including photoresist, thermal oxide and deposited oxide. Photoresist etches very rapidly in CO/NH 3 and use of a hard mask is necessary to achieve pattern transfer. Due to its physically dominated nature, the CO/NH3 chemistry appears suited to shallow etch depth (≤0.5mum) applications, but mask erosion leads to sloped feature sidewalls for deeper features.

Overlap junctions for high coherence superconducting qubits

NASA Astrophysics Data System (ADS)

Wu, X.; Long, J. L.; Ku, H. S.; Lake, R. E.; Bal, M.; Pappas, D. P.

2017-07-01

Fabrication of sub-micron Josephson junctions is demonstrated using standard processing techniques for high-coherence, superconducting qubits. These junctions are made in two separate lithography steps with normal-angle evaporation. Most significantly, this work demonstrates that it is possible to achieve high coherence with junctions formed on aluminum surfaces cleaned in situ by Ar plasma before junction oxidation. This method eliminates the angle-dependent shadow masks typically used for small junctions. Therefore, this is conducive to the implementation of typical methods for improving margins and yield using conventional CMOS processing. The current method uses electron-beam lithography and an additive process to define the top and bottom electrodes. Extension of this work to optical lithography and subtractive processes is discussed.

40 CFR Table I-4 to Subpart I - Table I-4 to Subpart I of Part 98-Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij...

Code of Federal Regulations, 2012 CFR

2012-07-01

... NA NA NA NA NA NA NA NA NA NA Chamber Cleaning In situ plasma cleaning: 1-Ui NA NA NA NA NA NA 0.23... NA NA NA NA NA In Situ Thermal Cleaning: 1-Ui NA NA NA NA NA NA 0.28 NA NA NA NA BCF4 NA NA NA NA NA...

Characteristics of 2-heptanone decomposition using nanosecond pulsed discharge plasma

NASA Astrophysics Data System (ADS)

Nakase, Yuki; Fukuchi, Yuichi; Wang, Douyan; Namihira, Takao; Akiyama, Hidenori; Kumamoto University Collaboration

2015-09-01

Volatile organic compounds (VOC) evaporate at room temperature. VOCs typically consist of toluene, benzene and ethyl acetate, which are used in cosmetics, dry cleaning products and paints. Exposure to elevated levels of VOCs may cause headaches, dizziness and irritation to the eyes, nose, and throat; they may also cause environmental problems such as air pollution, acid rain and photochemical smog. As such, they require prompt removal. Nanosecond pulsed discharge is a kind of non-thermal plasma consisting of a streamer discharge. Several advantages of nanosecond pulsed discharge plasma have been demonstrated by studies of our research group, including low heat loss, highly energetic electron generation, and the production of highly active radicals. These advantages have shown ns pulsed discharge plasma capable of higher energy efficiency for processes, such as air purification, wastewater treatment and ozone generation. In this research, nanosecond pulsed discharge plasma was employed to treat 2-heptanone, which is a volatile organic compound type and presents several harmful effects. Characteristics of treatment dependent on applied voltage, gas flow rate and input energy density were investigated. Furthermore, byproducts generated by treatment were also investigated.

Heated probe diagnostic inside of the gas aggregation nanocluster source

NASA Astrophysics Data System (ADS)

Kolpakova, Anna; Shelemin, Artem; Kousal, Jaroslav; Kudrna, Pavel; Tichy, Milan; Biederman, Hynek; Surface; Plasma Science Team

2016-09-01

Gas aggregation cluster sources (GAS) usually operate outside common working conditions of most magnetrons and the size of nanoparticles created in GAS is below that commonly studied in dusty plasmas. Therefore, experimental data obtained inside the GAS are important for better understanding of process of nanoparticles formation. In order to study the conditions inside the gas aggregation chamber, special ``diagnostic GAS'' has been constructed. It allows simultaneous monitoring (or spatial profiling) by means of optical emission spectroscopy, mass spectrometry and probe diagnostic. Data obtained from Langmuir and heated probes map the plasma parameters in two dimensions - radial and axial. Titanium has been studied as an example of metal for which the reactive gas in the chamber starts nanoparticles production. Three basic situations were investigated: sputtering from clean titanium target in argon, sputtering from partially pre-oxidized target and sputtering with oxygen introduced into the discharge. It was found that during formation of nanoparticles the plasma parameters differ strongly from the situation without nanoparticles. These experimental data will support the efforts of more realistic modeling of the process. Czech Science Foundation 15-00863S.

Atomic Oxygen Lamp Cleaning Facility Fabricated and Tested

NASA Technical Reports Server (NTRS)

Sechkar, Edward A.; Stueber, Thomas J.

1999-01-01

NASA Lewis Research Center's Atomic Oxygen Lamp Cleaning Facility was designed to produce an atomic oxygen plasma within a metal halide lamp to remove carbon-based contamination. It is believed that these contaminants contribute to the high failure rate realized during the production of these lamps. The facility is designed to evacuate a metal halide lamp and produce a radio frequency generated atomic oxygen plasma within it. Oxygen gas, with a purity of 0.9999 percent and in the pressure range of 150 to 250 mtorr, is used in the lamp for plasma generation while the lamp is being cleaned. After cleaning is complete, the lamp can be backfilled with 0.9999-percent pure nitrogen and torch sealed. The facility comprises various vacuum components connected to a radiation-shielded box that encloses the bulb during operation. Radiofrequency power is applied to the two parallel plates of a capacitor, which are on either side of the lamp. The vacuum pump used, a Leybold Trivac Type D4B, has a pumping speed of 4-m3/hr, has an ultimate pressure of <8x10-4, and is specially adapted for pure oxygen service. The electronic power supply, matching network, and controller (500-W, 13.56-MHz) used to supply the radiofrequency power were purchased from RF Power Products Inc. Initial test results revealed that this facility could remove the carbon-based contamination from within bulbs.

Control of surface defects on plasma-MIG hybrid welds in cryogenic aluminum alloys

NASA Astrophysics Data System (ADS)

Lee, Hee-Keun; Chun, Kwang-San; Park, Sang-Hyeon; Kang, Chung-Yun

2015-07-01

Lately, high production rate welding processes for Al alloys, which are used as LNG FPSO cargo containment system material, have been developed to overcome the limit of installation and high rework rates. In particular, plasma-metal inert gas (MIG) hybrid (PMH) welding can be used to obtain a higher deposition rate and lower porosity, while facilitating a cleaning effect by preheating and post heating the wire and the base metal. However, an asymmetric undercut and a black-colored deposit are created on the surface of PMH weld in Al alloys. For controlling the surface defect formation, the wire feeding speed and nozzle diameter in the PMH weld was investigated through arc phenomena with high-speed imaging and metallurgical analysis.

Characterization of microwave discharge plasmas for surface processing

NASA Astrophysics Data System (ADS)

Nikolic, Milka

We have developed several diagnostic techniques to characterize two types of microwave (MW) discharge plasmas: a supersonic flowing argon MW discharge maintained in a cylindrical quartz cavity at frequency ƒ = 2.45 GHz and a pulse repetitive MW discharge in air at ƒ = 9.5 GHz. Low temperature MW discharges have been proven to posses attractive properties for plasma cleaning and etching of niobium surfaces of superconductive radio frequency (SRF) cavities. Plasma based surface modification technologies offer a promising alternative for etching and cleaning of SRF cavities. These technologies are low cost, environmentally friendly and easily controllable, and present a possible alternative to currently used acid based wet technologies, such as buffered chemical polishing (BCP), or electrochemical polishing (EP). In fact, weakly ionized. non-equilibrium, and low temperature gas discharges represent a powerful tool for surface processing due to the strong chemical reactivity of plasma radicals. Therefore, characterizing these discharges by applying non-perturbing, in situ measurement techniques is of vital importance. Optical emission spectroscopy has been employed to analyze the molecular structure and evaluate rotational and vibrational temperatures in these discharges. The internal plasma structure was studied by applying a tomographic numerical method based on the two-dimensional Radon formula. An automated optical measurement system has been developed for reconstruction of local plasma parameters. It was found that excited argon states are concentrated near the tube walls, thus confirming the assumption that the post discharge plasma is dominantly sustained by a travelling surface wave. Employing a laser induced fluorescence technique in combination with the time synchronization device allowed us to obtain time-resolved population densities of some excited atomic levels in argon. We have developed a technique for absolute measurements of electron density based on the time-resolved absolute intensity of a Nitrogen spectral band belonging to the Second Positive System, the kinetic model and the detailed particle balance of the N2 (C 3piu) state. Measured electron density waveforms are in fair agreement with electron densities obtained using the Stark broadening technique. In addition, time dependent population densities of Ar I metastable and resonant levels were obtained by employing a kinetic model developed based on analysis of population density rates of excited Ar I p levels. Both the experimental results and numerical models for both types of gas discharges indicate that multispecies chemistry of gases plays an important role in understanding the dynamics and characterizing the properties of these discharges.

Plasma and catalyst for the oxidation of NOx

NASA Astrophysics Data System (ADS)

Jõgi, Indrek; Erme, Kalev; Levoll, Erik; Raud, Jüri; Stamate, Eugen

2018-03-01

Efficient exhaust gas cleaning from NO x (NO and NO2) by absorption and adsorption based methods requires the oxidation of NO. The application of non-thermal plasma is considered as a promising oxidation method but the oxidation of NO by direct plasma remains limited due to the back-reaction of NO2 to NO mediated by O radicals in plasma. Indirect NO oxidation by plasma produced ozone allows to circumvent the back-reaction and further oxidize NO2 to N2O5 but the slow reaction rate for the latter process limits the efficiency of this process. Present paper gives an overview of the role of metal-oxide catalysts in the improvement of oxidation efficiency for both direct and indirect plasma oxidation of NO x . The plasma produced active oxygen species (O, O3) were shown to play an important role in the reactions taking place on the catalyst surfaces while the exact mechanism and extent of the effect were different for direct and indirect oxidation. In the case of direct plasma oxidation, both short and long lifetime oxygen species could reach the catalyst and participate in the oxidation of NO to NO2. The back-reaction in the plasma phase remained still important factor and limited the effect of catalyst. In the case of indirect oxidation, only ozone could reach the catalyst surface and improve the oxidation of NO2 to N2O5. The effect of catalyst at different experimental conditions was quantitatively described with the aid of simple global chemical kinetic models derived for the NO x oxidation either by plasma or ozone. The models allowed to compare the effect of different catalysts and to analyze the limitations for the efficiency improvement by catalyst.

Cleaning of HT-7 Tokamak Exposed First Mirrors by Radio Frequency Magnetron Sputtering Plasma

NASA Astrophysics Data System (ADS)

Yan, Rong; Chen, Junling; Chen, Longwei; Ding, Rui; Zhu, Dahuan

2014-12-01

The stainless steel (SS) first mirror pre-exposed in the deposition-dominated environment of the HT-7 tokamak was cleaned in the newly built radio frequency (RF) magnetron sputtering plasma device. The deposition layer on the FM surface formed during the exposure was successfully removed by argon plasma with a RF power of about 80 W and a gas pressure of 0.087 Pa for 30 min. The total reflectivity of the mirrors was recovered up to 90% in the wavelength range of 300-800 nm, while the diffuse reflectivity showed a little increase, which was attributed to the increase of surface roughness in sputtering, and residual contaminants. The FMs made from single crystal materials could help to achieve a desired recovery of specular reflectivity in the future.

Contrast Enhancement of the LOASIS CPA Laser and Effects on Electron Beam Performance of LWFA

DOE Office of Scientific and Technical Information (OSTI.GOV)

Toth, Csaba; Gonsalves, Anthony J.; Panasenko, Dmitriy

2009-01-22

A nonlinear optical pulse cleaning technique based on cross-polarized wave (XPW) generation filtering [1] has been implemented to improve laser pulse contrast, and consequently to control pre-ionization in laser-plasma accelerator experiments. Three orders of magnitude improvement in pre-pulse contrast has been achieved, resulting in 4-fold increase in electron charge and improved stability of both the electron beam energy and THz radiation generated as a secondary process in the gas-jet-based LWFA experiments.

New disinfection and sterilization methods.

PubMed Central

Rutala, W. A.; Weber, D. J.

2001-01-01

New disinfection methods include a persistent antimicrobial coating that can be applied to inanimate and animate objects (Surfacine), a high-level disinfectant with reduced exposure time (ortho-phthalaldehyde), and an antimicrobial agent that can be applied to animate and inanimate objects (superoxidized water). New sterilization methods include a chemical sterilization process for endoscopes that integrates cleaning (Endoclens), a rapid (4-hour) readout biological indicator for ethylene oxide sterilization (Attest), and a hydrogen peroxide plasma sterilizer that has a shorter cycle time and improved efficacy (Sterrad 50). PMID:11294738

Simultaneous imaging/reflectivity measurements to assess diagnostic mirror cleaning.

PubMed

Skinner, C H; Gentile, C A; Doerner, R

2012-10-01

Practical methods to clean ITER's diagnostic mirrors and restore reflectivity will be critical to ITER's plasma operations. We describe a technique to assess the efficacy of mirror cleaning techniques and detect any damage to the mirror surface. The method combines microscopic imaging and reflectivity measurements in the red, green, and blue spectral regions and at selected wavelengths. The method has been applied to laser cleaning of single crystal molybdenum mirrors coated with either carbon or beryllium films 150-420 nm thick. It is suitable for hazardous materials such as beryllium as the mirrors remain sealed in a vacuum chamber.

Multihole Arc-Welding Orifice

NASA Technical Reports Server (NTRS)

Swaim, Benji D.

1989-01-01

Modified orifice for variable-polarity plasma-arc welding directs welding plume so it creates clean, even welds on both Inconel(R) and aluminum alloys. Includes eight holes to relieve back pressure in plasma. Quality of welds on ferrous and nonferrous alloys improved as result.

Estimation of Qualitative and Quantitative Parameters of Air Cleaning by a Pulsed Corona Discharge Using Multicomponent Standard Mixtures

NASA Astrophysics Data System (ADS)

Filatov, I. E.; Uvarin, V. V.; Kuznetsov, D. L.

2018-05-01

The efficiency of removal of volatile organic impurities in air by a pulsed corona discharge is investigated using model mixtures. Based on the method of competing reactions, an approach to estimating the qualitative and quantitative parameters of the employed electrophysical technique is proposed. The concept of the "toluene coefficient" characterizing the relative reactivity of a component as compared to toluene is introduced. It is proposed that the energy efficiency of the electrophysical method be estimated using the concept of diversified yield of the removal process. Such an approach makes it possible to substantially intensify the determination of energy parameters of removal of impurities and can also serve as a criterion for estimating the effectiveness of various methods in which a nonequilibrium plasma is used for air cleaning from volatile impurities.

Ion energy distributions in bipolar pulsed-dc discharges of methane measured at the biased cathode

NASA Astrophysics Data System (ADS)

Corbella, C.; Rubio-Roy, M.; Bertran, E.; Portal, S.; Pascual, E.; Polo, M. C.; Andújar, J. L.

2011-02-01

The ion fluxes and ion energy distributions (IED) corresponding to discharges in methane (CH4) were measured in time-averaged mode with a compact retarding field energy analyser (RFEA). The RFEA was placed on a biased electrode at room temperature, which was powered by either radiofrequency (13.56 MHz) or asymmetric bipolar pulsed-dc (250 kHz) signals. The shape of the resulting IED showed the relevant populations of ions bombarding the cathode at discharge parameters typical in the material processing technology: working pressures ranging from 1 to 10 Pa and cathode bias voltages between 100 and 200 V. High-energy peaks in the IED were detected at low pressures, whereas low-energy populations became progressively dominant at higher pressures. This effect is attributed to the transition from collisionless to collisional regimes of the cathode sheath as the pressure increases. On the other hand, pulsed-dc plasmas showed broader IED than RF discharges. This fact is connected to the different working frequencies and the intense peak voltages (up to 450 V) driven by the pulsed power supply. This work improves our understanding in plasma processes at the cathode level, which are of crucial importance for the growth and processing of materials requiring controlled ion bombardment. Examples of industrial applications with these requirements are plasma cleaning, ion etching processes during fabrication of microelectronic devices and plasma-enhanced chemical vapour deposition of hard coatings (diamond-like carbon, carbides and nitrides).

Cleaning procedure for improved photothermal background of toroidal optical microresonators

NASA Astrophysics Data System (ADS)

Horak, Erik H.; Knapper, Kassandra A.; Heylman, Kevin D.; Goldsmith, Randall H.

2016-09-01

High Q-factors and small mode volumes have made toroidal optical microresonators exquisite sensors to small shifts in the effective refractive index of the WGM modes. Eliminating contaminants and improving quality factors is key for many different sensing techniques, and is particularly important for photothermal imaging as contaminants add photothermal background obscuring objects of interest. Several different cleaning procedures including wet- and dry-chemical procedures are tested for their effect on Q-factors and photothermal background. RCA cleaning was shown to be successful in contrast to previously described acid cleaning procedures, most likely due to the different surface reactivity of the acid reagents used. UV-ozone cleaning was shown to be vastly superior to O2 plasma cleaning procedures, significantly reducing the photothermal background of the resonator.

Alternative Solvents through Green Chemistry Project

NASA Technical Reports Server (NTRS)

Hintze, Paul E.; Quinn, Jacqueline

2014-01-01

Components in the aerospace industry must perform with accuracy and precision under extreme conditions, and surface contamination can be detrimental to the desired performance, especially in cases when the components come into contact with strong oxidizers such as liquid oxygen. Therefore, precision cleaning is an important part of a components preparation prior to utilization in aerospace applications. Current cleaning technologies employ a variety of cleaning agents, many of which are halogenated solvents that are either toxic or cause environmental damage. Thus, this project seeks to identify alternative precision cleaning solvents and technologies, including use of less harmful cleaning solvents, ultrasonic and megasonic agitation, low-pressure plasma cleaning techniques, and supercritical carbon dioxide extraction. Please review all data content found in the Public Data tab located at: https:techport.nasa.govview11697public

Development of a laser cleaning method for the first mirror surface of the charge exchange recombination spectroscopy diagnostics on ITER

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kuznetsov, A. P., E-mail: APKuznetsov@mephi.ru; Buzinskij, O. I.; Gubsky, K. L.

A set of optical diagnostics is expected for measuring the plasma characteristics in ITER. Optical elements located inside discharge chambers are exposed to an intense radiation load, sputtering due to collisions with energetic atoms formed in the charge transfer processes, and contamination due to recondensation of materials sputtered from different parts of the construction of the chamber. Removing the films of the sputtered materials from the mirrors with the aid of pulsed laser radiation is an efficient cleaning method enabling recovery of the optical properties of the mirrors. In this work, we studied the efficiency of removal of metal oxidemore » films by pulsed radiation of a fiber laser. Optimization of the laser cleaning conditions was carried out on samples representing metal substrates polished with optical quality with deposition of films on them imitating the chemical composition and conditions expected in ITER. It is shown that, by a proper selection of modes of radiation exposure to the surface with a deposited film, it is feasible to restore the original high reflection characteristics of optical elements.« less

Process for the formation of wear- and scuff-resistant carbon coatings

DOEpatents

Malaczynski, Gerard W.; Qiu, Xiaohong; Mantese, Joseph V.; Elmoursi, Alaa A.; Hamdi, Aboud H.; Wood, Blake P.; Walter, Kevin C.; Nastasi, Michael A.

1995-01-01

A process for forming an adherent diamond-like carbon coating on a workpiece of suitable material such as an aluminum alloy is disclosed. The workpiece is successively immersed in different plasma atmospheres and subjected to short duration, high voltage, negative electrical potential pulses or constant negative electrical potentials or the like so as to clean the surface of oxygen atoms, implant carbon atoms into the surface of the alloy to form carbide compounds while codepositing a carbonaceous layer on the surface, bombard and remove the carbonaceous layer, and to thereafter deposit a generally amorphous hydrogen-containing carbon layer on the surface of the article.

Beam cleaning of an incoherent laser via plasma Raman amplification

DOE PAGES

Edwards, Matthew R.; Qu, Kenan; Mikhailova, Julia M.; ...

2017-09-25

We show that backward Raman amplification in plasma can efficiently compress a temporally incoherent pump laser into an intense coherent amplified seed pulse, provided that the correlation time of the pump is longer than the inverse plasma frequency. One analytical theory for Raman amplification using pump beams with different correlation functions is developed and compared to numerical calculations and particle-in-cell simulations. Since incoherence on scales shorter than the instability growth time suppresses spontaneous noise amplification, we point out a broad regime where quasi-coherent sources may be used as efficient low-noise Raman amplification pumps. As the amplified seed is coherent, Ramanmore » amplification provides an additional a beam-cleaning mechanism for removing incoherence. At near-infrared wavelengths, finite coherence times as short as 50 fs allow amplification with only minor losses in efficiency.« less

Beam cleaning of an incoherent laser via plasma Raman amplification

DOE Office of Scientific and Technical Information (OSTI.GOV)

Edwards, Matthew R.; Qu, Kenan; Mikhailova, Julia M.

We show that backward Raman amplification in plasma can efficiently compress a temporally incoherent pump laser into an intense coherent amplified seed pulse, provided that the correlation time of the pump is longer than the inverse plasma frequency. One analytical theory for Raman amplification using pump beams with different correlation functions is developed and compared to numerical calculations and particle-in-cell simulations. Since incoherence on scales shorter than the instability growth time suppresses spontaneous noise amplification, we point out a broad regime where quasi-coherent sources may be used as efficient low-noise Raman amplification pumps. As the amplified seed is coherent, Ramanmore » amplification provides an additional a beam-cleaning mechanism for removing incoherence. At near-infrared wavelengths, finite coherence times as short as 50 fs allow amplification with only minor losses in efficiency.« less

Tracing the signatures of heavy ions in the plasma environment of 67P/Churyumov-Gerasimenko: Ion Composition Analyzer (ICA) observations

NASA Astrophysics Data System (ADS)

Nicolaou, G.; Yamauchi, M.; Wieser, M.; Nilsson, H.; Behar, E.; Stenberg Wieser, G.

2016-12-01

The Ion Composition Analyzer (ICA) on board ROSETTA is a part of the Rosetta Plasma Consortium (RPC). It is designed to measure the 3-D velocity distribution function of the plasma ions in the environment of the comet 67P/Churyumov-Gerasimenko. Besides the solar wind plasma ions, ICA detected the heavy ions of cometary origin at both low energy (< 100 eV) and at the keV range. So far, ICA distinguished ions of water origin but in principle it should be able to detect CO2+. However, we have not yet succeeded to separate CO2+ ions from O+ or H2O+ ion, mainly due to non-uniform sensitivity and noise level at different mass-channels//azimuthal-sectors, and high cross talk. In May 2016, when ROSETTA was relatively close to the comet (between 6 and 20 km), we observe a second plasma ion population in a higher energy per charge range ( 60-200 eV/q) than the water group ions at 30- 50eV/q. To examine whether this secondary population is still the water group or other ions, such as CO2+, we cleaned the raw data by correcting the non-uniform sensitivity assuming that the noise level should be uniform over different channels. After such a simple cleaning we already found that the mass peak at low energy and that for higher-energy are occasionally similar but in some cases are quite different. Furthermore, we investigate few cases where the low-energy mass peak seems to consist of different Gaussian slopes, indicating that this peak could be composed of two mass peaks. In this presentation we show our techniques we follow to process the data, and we show how we identify the secondary ion component from the May 2016 data.

Atmospheric pressure plasma jet's characterization and surface wettability driven by neon transformer

NASA Astrophysics Data System (ADS)

Elfa, R. R.; Nafarizal, N.; Ahmad, M. K.; Sahdan, M. Z.; Soon, C. F.

2017-03-01

Atmospheric pressure plasma driven by Neon transformer power supply argon is presented in this paper. Atmospheric pressure plasma system has attracted researcher interest over low pressure plasma as it provides a flexibility process, cost-efficient, portable device and vacuum-free device. Besides, another golden key of this system is the wide promising application in the field of work cover from industrial and engineering to medical. However, there are still numbers of fundamental investigation that are necessary such as device configuration, gas configuration and its effect. Dielectric barrier discharge which is also known as atmospheric pressure plasma discharge is created when there is gas ionization process occur which enhance the movement of atom and electron and provide energetic particles. These energetic particles can provide modification and cleaning property to the sample surface due to the bombardment of the high reactive ion and radicals to the sample surface. In order to develop atmospheric pressure plasma discharge, a high voltage and high frequency power supply is needed. In this work, we used a neon transformer power supply as the power supply. The flow of the Ar is feed into 10 mm cylinder quartz tube with different treatment time in order to investigate the effect of the plasma discharge. The analysis of each treatment time is presented by optical emission spectroscopy (OES) and water contact angle (WCA) measurement. The increase of gas treatment time shows increases intensity of reactive Ar and reduces the angle of water droplets in water contact angle. Treatment time of 20 s microslide glass surface shows that the plasma needle discharges have modified the sample surface from hydrophilic surface to superhydrophilic surface. Thus, this leads to another interesting application in reducing sample surface adhesion to optimize productivity in the industry of paintings, semiconductor and more.

Visualization of flow during cleaning process on a liquid nanofibrous filter

NASA Astrophysics Data System (ADS)

Bílek, P.

2017-10-01

This paper deals with visualization of flow during cleaning process on a nanofibrous filter. Cleaning of a filter is very important part of the filtration process which extends lifetime of the filter and improve filtration properties. Cleaning is carried out on flat-sheet filters, where particles are deposited on the filter surface and form a filtration cake. The cleaning process dislodges the deposited filtration cake, which is loose from the membrane surface to the retentate flow. The blocked pores in the filter are opened again and hydrodynamic properties are restored. The presented optical method enables to see flow behaviour in a thin laser sheet on the inlet side of a tested filter during the cleaning process. The local concentration of solid particles is possible to estimate and achieve new information about the cleaning process. In the article is described the cleaning process on nanofibrous membranes for waste water treatment. The hydrodynamic data were compared to the images of the cleaning process.

Cleaning of optical surfaces by capacitively coupled RF discharge plasma

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yadav, P. K., E-mail: praveenyadav@rrcat.gov.in; Rai, S. K.; Nayak, M.

2014-04-24

In this paper, we report cleaning of carbon capped molybdenum (Mo) thin film by in-house developed radio frequency (RF) plasma reactor, at different powers and exposure time. Carbon capped Mo films were exposed to oxygen plasma for different durations at three different power settings, at a constant pressure. After each exposure, the thickness of the carbon layer and the roughness of the film were determined by hard x-ray reflectivity measurements. It was observed that most of the carbon film got removed in first 15 minutes exposure. A high density layer formed on top of the Mo film was also observedmore » and it was noted that this layer cannot be removed by successive exposures at different powers. A significant improvement in interface roughness with a slight improvement in top film roughness was observed. The surface roughness of the exposed and unexposed samples was also confirmed by atomic force microscopy measurements.« less

Barrier SiO2-like coatings for archaeological artefacts preservation

NASA Astrophysics Data System (ADS)

Prochazka, M.; Blahova, L.; Krcma, F.

2016-10-01

Thin film chemical vapour deposition technique has been used for more than 50 years. Introducing organo-silicones as precursors, e.g. hexamethyldisiloxane (HMDSO) or tetraethyl orthosilicate (TEOS), brought new possibilities to this method. Barrier properties of thin films have become an important issue, especially for army and emergency services as well as for food and drink manufacturers. Our work is focused on protective HMDSO thin films for encapsulating cleaned archaeological artefacts, preventing the corrosion from destroying these historical items.Thin films are deposited via plasma enhanced chemical vapour deposition (PECVD) technique using low pressure capacitively coupled pasma in flow regime. Oxygen transmission rate (OTR) measurement was chosen as the most important one for characterization of barrier properties of deposited thin films. Lowest OTR reached for 50 nm thin film thickness was 120 cm3 m-2 atm-1 day-1. Samples were also analyzed by Fourier Transform Infrared spectrometry (FTIR) to determine their composition. Optical emission spectra and thin film thickness were measured during the deposition process. We optimized the deposition parameters for barrier layers by implementation of pulsed mode of plasma and argon plasma pre-treatment into the process.

Optimizing surface finishing processes through the use of novel solvents and systems

NASA Astrophysics Data System (ADS)

Quillen, M.; Holbrook, P.; Moore, J.

2007-03-01

As the semiconductor industry continues to implement the ITRS (International Technology Roadmap for Semiconductors) node targets that go beyond 45nm [1], the need for improved cleanliness between repeated process steps continues to grow. Wafer cleaning challenges cover many applications such as Cu/low-K integration, where trade-offs must be made between dielectric damage and residue by plasma etching and CMP or moisture uptake by aqueous cleaning products. [2-5] Some surface sensitive processes use the Marangoni tool design [6] where a conventional solvent such as IPA (isopropanol), combines with water to provide improved physical properties such as reduced contact angle and surface tension. This paper introduces the use of alternative solvents and their mixtures compared to pure IPA in removing ionics, moisture, and particles using immersion bench-chemistry models of various processes. A novel Eastman proprietary solvent, Eastman methyl acetate is observed to provide improvement in ionic, moisture capture, and particle removal, as compared to conventional IPA. [7] These benefits may be improved relative to pure IPA, simply by the addition of various additives. Some physical properties of the mixtures were found to be relatively unchanged even as measured performance improved. This report presents our attempts to cite and optimize these benefits through the use of laboratory models.

Progress Toward Kelvin-Helmholtz instabilities in a High-Energy-Density Plasma on the Nike Laser

NASA Astrophysics Data System (ADS)

Harding, E. C.; Drake, R. P.; Aglitskiy, Y.; Dwarkadas, V. V.; Gillespie, R. S.; Grosskopf, M. J.; Huntington, C. M.; Gjeci, N.; Campbell, D. A.; Marion, D. C.

2007-11-01

In the realm of high-energy-density (HED) plasmas, there exist three primary hydrodynamic instabilities: Rayleigh-Taylor (RT), Richtmyer-Meshkov (RM), and Kelvin-Helmholtz (KH). Although the RT and the RM instabilities have been observed in the laboratory, no experiment to our knowledge has cleanly diagnosed the KH instability. While the RT instability results from the acceleration of a more dense fluid into a less dense fluid and the RM instability is due to shock deposited vorticity onto an interface, the KH instability is driven by a lifting force generated by velocity shear at a perturbed fluid interface. Understanding the KH instability mechanism in HED plasmas will provide essential insight into detailed RT-spike development, mass stripping, many astrophysical processes, as well as laying the groundwork for future transition to turbulence experiments. We present 2D simulations and data from our initial attempts to create a pure KH system using the Nike laser at the Naval Research Laboratory.

Raman enhancement on ultra-clean graphene quantum dots produced by quasi-equilibrium plasma-enhanced chemical vapor deposition.

PubMed

Liu, Donghua; Chen, Xiaosong; Hu, Yibin; Sun, Tai; Song, Zhibo; Zheng, Yujie; Cao, Yongbin; Cai, Zhi; Cao, Min; Peng, Lan; Huang, Yuli; Du, Lei; Yang, Wuli; Chen, Gang; Wei, Dapeng; Wee, Andrew Thye Shen; Wei, Dacheng

2018-01-15

Graphene is regarded as a potential surface-enhanced Raman spectroscopy (SERS) substrate. However, the application of graphene quantum dots (GQDs) has had limited success due to material quality. Here, we develop a quasi-equilibrium plasma-enhanced chemical vapor deposition method to produce high-quality ultra-clean GQDs with sizes down to 2 nm directly on SiO 2 /Si, which are used as SERS substrates. The enhancement factor, which depends on the GQD size, is higher than conventional graphene sheets with sensitivity down to 1 × 10 -9  mol L -1 rhodamine. This is attributed to the high-quality GQDs with atomically clean surfaces and large number of edges, as well as the enhanced charge transfer between molecules and GQDs with appropriate diameters due to the existence of Van Hove singularities in the electronic density of states. This work demonstrates a sensitive SERS substrate, and is valuable for applications of GQDs in graphene-based photonics and optoelectronics.

Aqueous cleaning and verification processes for precision cleaning of small parts

NASA Technical Reports Server (NTRS)

Allen, Gale J.; Fishell, Kenneth A.

1995-01-01

The NASA Kennedy Space Center (KSC) Materials Science Laboratory (MSL) has developed a totally aqueous process for precision cleaning and verification of small components. In 1990 the Precision Cleaning Facility at KSC used approximately 228,000 kg (500,000 lbs) of chlorofluorocarbon (CFC) 113 in the cleaning operations. It is estimated that current CFC 113 usage has been reduced by 75 percent and it is projected that a 90 percent reduction will be achieved by the end of calendar year 1994. The cleaning process developed utilizes aqueous degreasers, aqueous surfactants, and ultrasonics in the cleaning operation and an aqueous surfactant, ultrasonics, and Total Organic Carbon Analyzer (TOCA) in the nonvolatile residue (NVR) and particulate analysis for verification of cleanliness. The cleaning and verification process is presented in its entirety, with comparison to the CFC 113 cleaning and verification process, including economic and labor costs/savings.

Determination of vitamins D2, D3, K1 and K3 and some hydroxy metabolites of vitamin D3 in plasma using a continuous clean-up-preconcentration procedure coupled on-line with liquid chromatography-UV detection.

PubMed

Ortiz Boyer, F; Fernández Romero, J M; Luque de Castro, M D; Quesada, J M

1999-03-01

A semi-automatic procedure for the continuous clean-up and concentration of several fat-soluble vitamins prior to their separation by HPLC and UV detection is reported. The procedure is based on the use of a minicolumn packed with aminopropylsilica as sorbent located prior to the chromatographic detection system. The overall process was developed and applied to the main liposoluble vitamins (A, D2, D3, E, K1, K3) and several hydroxy metabolites of vitamin D3 [25-(OH)-D3,24,25-(OH)2-D3 and 1,25-(OH)2-D3]. All the analytes were monitored at a compromise wavelength of 270 nm. Calibration graphs were constructed between 0.01 and 100 ng ml-1 for vitamin D2 and D3 and their hydroxy metabolites, between 0.1 and 100 ng ml-1 for vitamin A, K1 and K3 and between 1 and 100 ng ml-1 for vitamin E, with excellent regression coefficients (> or = 0.9901) in all cases. The precision was established at two concentration levels with acceptable RSDs in all instances (between 3.6 and 8.7%). The method was appropriate for the determination of vitamin D2, D3, K1 and K3 and the 24,25-dihydroxy and 25-hydroxy metabolites of vitamin D3 in human plasma. The method was applied to plasma samples spiked with the target analytes and the recoveries ranged between 78 and 109%.

Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source

NASA Astrophysics Data System (ADS)

Elg, Daniel T.; Panici, Gianluca A.; Peck, Jason A.; Srivastava, Shailendra N.; Ruzic, David N.

2017-04-01

Extreme ultraviolet (EUV) lithography sources expel Sn debris. This debris deposits on the collector optic used to focus the EUV light, lowering its reflectivity and EUV throughput to the wafer. Consequently, the collector must be cleaned, causing source downtime. To solve this, a hydrogen plasma source was developed to clean the collector in situ by using the collector as an antenna to create a hydrogen plasma and create H radicals, which etch Sn as SnH4. This technique has been shown to remove Sn from a 300-mm-diameter stainless steel dummy collector. The H radical density is of key importance in Sn etching. The effects of power, pressure, and flow on radical density are explored. A catalytic probe has been used to measure radical density, and a zero-dimensional model is used to provide the fundamental science behind radical creation and predict radical densities. Model predictions and experimental measurements are in good agreement. The trends observed in radical density, contrasted with measured Sn removal rates, show that radical density is not the limiting factor in this etching system; other factors, such as SnH4 redeposition and energetic ion bombardment, must be more fully understood in order to predict removal rates.

Inactivation of Escherichia coli and Staphylococcus aureus on contaminated perilla leaves by Dielectric Barrier Discharge (DBD) plasma treatment.

PubMed

Ji, Sang Hye; Ki, Se Hoon; Ahn, Ji Ho; Shin, Jae Ho; Hong, Eun Jeong; Kim, Yun Ji; Choi, Eun Ha

2018-04-02

This study focused on sterilization methods for the reduction of microorganisms on perilla leaves by cylinder type Dielectric Barrier Discharge (DBD) plasma with underwater bubbler treatment. S. aureus and E. coli in a suspension were reduced to less than 3.4 and 0.5 log CFU/ml after the plasma treatment for 3 min, respectively. On the perilla leaves, they were also reduced to 4.8 and 1.6 log CFU/ml after the plasma treatment, respectively. The S. aureus and E. coli bacterial cell wall was damaged by the plasma treatment evident by scanning electron microscopic analysis. The observed infrared bands of the FTIR spectra demonstrated changes in protein, lipid, polysaccharide, polyphosphate group and other carbohydrate functionalities of plasma treated bacteria and untreated bacterial cell membranes. The degradation of the constituent bonds of the bacterial cell membrane by RONS generated from plasma destroys the DNA, RNA, and proteins within the cell, and may eventually cause cell death. In this study, H 2 O 2 (13.68 μM) and NO 3 (138 μM), which are the main factors generated by plasma, proved to have a bactericidal effect by inducing lipid peroxidation of bacterial cell membranes. In conclusion, cylinder type DBD plasma with underwater bubbler can be used as an environmentally friendly food disinfection device in cleaning processes of the food industry. Copyright © 2018 Elsevier Inc. All rights reserved.

Self-Cleaning Ceramic Tiles Produced via Stable Coating of TiO₂ Nanoparticles.

PubMed

Shakeri, Amid; Yip, Darren; Badv, Maryam; Imani, Sara M; Sanjari, Mehdi; Didar, Tohid F

2018-06-13

The high photocatalytic power of TiO₂ nanoparticles has drawn great attention in environmental and medical applications. Coating surfaces with these particles enables us to benefit from self-cleaning properties and decomposition of pollutants. In this paper, two strategies have been introduced to coat ceramic tiles with TiO₂ nanoparticles, and the self-cleaning effect of the surfaces on degradation of an organic dye under ultraviolent (UV) exposure is investigated. In the first approach, a simple one-step heat treatment method is introduced for coating, and different parameters of the heat treatment process are examined. In the second method, TiO₂ nanoparticles are first aminosilanized using (3-Aminopropyl)triethoxysilane (APTES) treatment followed by their covalently attachment onto CO₂ plasma treated ceramic tiles via N -(3-Dimethylaminopropyl)- N ′-ethylcarbodiimide hydrochloride (EDC) and N -Hydroxysuccinimide (NHS) chemistry. We monitor TiO₂ nanoparticle sizes throughout the coating process using dynamic light scattering (DLS) and characterize developed surfaces using X-ray photoelectron spectroscopy (XPS). Moreover, hydrophilicity of the coated surfaces is quantified using a contact angle measurement. It is shown that applying a one-step heat treatment process with the optimum temperature of 200 °C for 5 h results in successful coating of nanoparticles and rapid degradation of dye in a short time. In the second strategy, the APTES treatment creates a stable covalent coating, while the photocatalytic capability of the particles is preserved. The results show that coated ceramic tiles are capable of fully degrading the added dyes under UV exposure in less than 24 h.

Effect of Dielectric and Liquid on Plasma Sterilization Using Dielectric Barrier Discharge Plasma

PubMed Central

Mastanaiah, Navya; Johnson, Judith A.; Roy, Subrata

2013-01-01

Plasma sterilization offers a faster, less toxic and versatile alternative to conventional sterilization methods. Using a relatively small, low temperature, atmospheric, dielectric barrier discharge surface plasma generator, we achieved ≥6 log reduction in concentration of vegetative bacterial and yeast cells within 4 minutes and ≥6 log reduction of Geobacillus stearothermophilus spores within 20 minutes. Plasma sterilization is influenced by a wide variety of factors. Two factors studied in this particular paper are the effect of using different dielectric substrates and the significance of the amount of liquid on the dielectric surface. Of the two dielectric substrates tested (FR4 and semi-ceramic (SC)), it is noted that the FR4 is more efficient in terms of time taken for complete inactivation. FR4 is more efficient at generating plasma as shown by the intensity of spectral peaks, amount of ozone generated, the power used and the speed of killing vegetative cells. The surface temperature during plasma generation is also higher in the case of FR4. An inoculated FR4 or SC device produces less ozone than the respective clean devices. Temperature studies show that the surface temperatures reached during plasma generation are in the range of 30°C–66°C (for FR4) and 20°C–49°C (for SC). Surface temperatures during plasma generation of inoculated devices are lower than the corresponding temperatures of clean devices. pH studies indicate a slight reduction in pH value due to plasma generation, which implies that while temperature and acidification may play a minor role in DBD plasma sterilization, the presence of the liquid on the dielectric surface hampers sterilization and as the liquid evaporates, sterilization improves. PMID:23951023

Effect of dielectric and liquid on plasma sterilization using dielectric barrier discharge plasma.

PubMed

Mastanaiah, Navya; Johnson, Judith A; Roy, Subrata

2013-01-01

Plasma sterilization offers a faster, less toxic and versatile alternative to conventional sterilization methods. Using a relatively small, low temperature, atmospheric, dielectric barrier discharge surface plasma generator, we achieved ≥ 6 log reduction in concentration of vegetative bacterial and yeast cells within 4 minutes and ≥ 6 log reduction of Geobacillus stearothermophilus spores within 20 minutes. Plasma sterilization is influenced by a wide variety of factors. Two factors studied in this particular paper are the effect of using different dielectric substrates and the significance of the amount of liquid on the dielectric surface. Of the two dielectric substrates tested (FR4 and semi-ceramic (SC)), it is noted that the FR4 is more efficient in terms of time taken for complete inactivation. FR4 is more efficient at generating plasma as shown by the intensity of spectral peaks, amount of ozone generated, the power used and the speed of killing vegetative cells. The surface temperature during plasma generation is also higher in the case of FR4. An inoculated FR4 or SC device produces less ozone than the respective clean devices. Temperature studies show that the surface temperatures reached during plasma generation are in the range of 30°C-66 °C (for FR4) and 20 °C-49 °C (for SC). Surface temperatures during plasma generation of inoculated devices are lower than the corresponding temperatures of clean devices. pH studies indicate a slight reduction in pH value due to plasma generation, which implies that while temperature and acidification may play a minor role in DBD plasma sterilization, the presence of the liquid on the dielectric surface hampers sterilization and as the liquid evaporates, sterilization improves.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Wieser, Patti; Hopkins, David

The DOE Princeton Plasma Physics Laboratory (PPPL) collaborates to develop fusion as a safe, clean and abundant energy source for the future. This video discusses PPPL's research and development on plasma, the fourth state of matter. In this simulation of plasma turbulence inside PPPL's National Spherical Torus Experiment, the colorful strings represent higher and lower electron density in turbulent plasma as it circles around a donut-shaped fusion reactor; red and orange are higher density. This image is among those featured in the slide show, "Plasmas are Hot and Fusion is Cool," a production of PPPL and the Princeton University Broadcastmore » Center.« less

7 CFR 201.33 - Seed in bulk or large quantities; seed for cleaning or processing.

Code of Federal Regulations, 2014 CFR

2014-01-01

... quantities; seed for cleaning or processing. (a) In the case of seed in bulk, the information required under... seeds. (b) Seed consigned to a seed cleaning or processing establishment, for cleaning or processing for... pertaining to such seed show that it is “Seed for processing,” or, if the seed is in containers and in...

7 CFR 201.33 - Seed in bulk or large quantities; seed for cleaning or processing.

Code of Federal Regulations, 2012 CFR

2012-01-01

... quantities; seed for cleaning or processing. (a) In the case of seed in bulk, the information required under... seeds. (b) Seed consigned to a seed cleaning or processing establishment, for cleaning or processing for... pertaining to such seed show that it is “Seed for processing,” or, if the seed is in containers and in...

7 CFR 201.33 - Seed in bulk or large quantities; seed for cleaning or processing.

Code of Federal Regulations, 2011 CFR

2011-01-01

... quantities; seed for cleaning or processing. (a) In the case of seed in bulk, the information required under... seeds. (b) Seed consigned to a seed cleaning or processing establishment, for cleaning or processing for... pertaining to such seed show that it is “Seed for processing,” or, if the seed is in containers and in...

7 CFR 201.33 - Seed in bulk or large quantities; seed for cleaning or processing.

Code of Federal Regulations, 2010 CFR

2010-01-01

... quantities; seed for cleaning or processing. (a) In the case of seed in bulk, the information required under... seeds. (b) Seed consigned to a seed cleaning or processing establishment, for cleaning or processing for... pertaining to such seed show that it is “Seed for processing,” or, if the seed is in containers and in...

7 CFR 201.33 - Seed in bulk or large quantities; seed for cleaning or processing.

Code of Federal Regulations, 2013 CFR

2013-01-01

... quantities; seed for cleaning or processing. (a) In the case of seed in bulk, the information required under... seeds. (b) Seed consigned to a seed cleaning or processing establishment, for cleaning or processing for... pertaining to such seed show that it is “Seed for processing,” or, if the seed is in containers and in...

Development of atmospheric pressure large area plasma jet for sterilisation and investigation of molecule and plasma interaction

NASA Astrophysics Data System (ADS)

Zerbe, Kristina; Iberler, Marcus; Jacoby, Joachim; Wagner, Christopher

2016-09-01

The intention of the project is the development and improvement of an atmospheric plasma jet based on various discharge forms (e.g. DBD, RF, micro-array) for sterilisation of biomedical equipment and investigation of biomolecules under the influence of plasma stress. The major objective is to design a plasma jet with a large area and an extended length. Due to the success on small scale plasma sterilisation the request of large area plasma has increased. Many applications of chemical disinfection in environmental and medical cleaning could thereby be complemented. Subsequently, the interaction between plasma and biomolecules should be investigated to improve plasma strerilisation. Special interest will be on non equilibrium plasma electrons affecting the chemical bindings of organic molecules.

Cleaning Process Development for Metallic Additively Manufactured Parts

NASA Technical Reports Server (NTRS)

Tramel, Terri L.; Welker, Roger; Lowery, Niki; Mitchell, Mark

2014-01-01

Additive Manufacturing of metallic components for aerospace applications offers many advantages over traditional manufacturing techniques. As a new technology, many aspects of its widespread utilization remain open to investigation. Among these are the cleaning processes that can be used for post finishing of parts and measurements to verify effectiveness of the cleaning processes. Many cleaning and drying processes and measurement methods that have been used for parts manufactured using conventional techniques are candidates that may be considered for cleaning and verification of additively manufactured parts. Among these are vapor degreasing, ultrasonic immersion and spray cleaning, followed by hot air drying, vacuum baking and solvent displacement drying. Differences in porosity, density, and surface finish of additively manufactured versus conventionally manufactured parts may introduce new considerations in the selection of cleaning and drying processes or the method used to verify their effectiveness. This presentation will review the relative strengths and weaknesses of different candidate cleaning and drying processes as they may apply to additively manufactured metal parts for aerospace applications. An ultrasonic cleaning technique for exploring the cleanability of parts will be presented along with an example using additively manufactured Inconel 718 test specimens to illustrate its use. The data analysis shows that this ultrasonic cleaning approach results in a well-behaved ultrasonic cleaning/extraction behavior. That is, it does not show signs of accelerated cavitation erosion of the base material, which was later confirmed by neutron imaging. In addition, the analysis indicated that complete cleaning would be achieved by ultrasonic immersion cleaning at approximately 5 minutes, which was verified by subsequent cleaning of additional parts.

7 CFR 361.8 - Cleaning of imported seed and processing of certain Canadian-origin screenings.

Code of Federal Regulations, 2014 CFR

2014-01-01

... 7 Agriculture 5 2014-01-01 2014-01-01 false Cleaning of imported seed and processing of certain... SCREENINGS UNDER THE FEDERAL SEED ACT § 361.8 Cleaning of imported seed and processing of certain Canadian... compliance agreement for the cleaning of imported seed or processing of otherwise prohibited screenings from...

7 CFR 361.8 - Cleaning of imported seed and processing of certain Canadian-origin screenings.

Code of Federal Regulations, 2012 CFR

2012-01-01

... 7 Agriculture 5 2012-01-01 2012-01-01 false Cleaning of imported seed and processing of certain... SCREENINGS UNDER THE FEDERAL SEED ACT § 361.8 Cleaning of imported seed and processing of certain Canadian... compliance agreement for the cleaning of imported seed or processing of otherwise prohibited screenings from...

7 CFR 361.8 - Cleaning of imported seed and processing of certain Canadian-origin screenings.

Code of Federal Regulations, 2013 CFR

2013-01-01

... 7 Agriculture 5 2013-01-01 2013-01-01 false Cleaning of imported seed and processing of certain... SCREENINGS UNDER THE FEDERAL SEED ACT § 361.8 Cleaning of imported seed and processing of certain Canadian... compliance agreement for the cleaning of imported seed or processing of otherwise prohibited screenings from...

7 CFR 361.8 - Cleaning of imported seed and processing of certain Canadian-origin screenings.

Code of Federal Regulations, 2010 CFR

2010-01-01

... 7 Agriculture 5 2010-01-01 2010-01-01 false Cleaning of imported seed and processing of certain... SCREENINGS UNDER THE FEDERAL SEED ACT § 361.8 Cleaning of imported seed and processing of certain Canadian... compliance agreement for the cleaning of imported seed or processing of otherwise prohibited screenings from...

7 CFR 361.8 - Cleaning of imported seed and processing of certain Canadian-origin screenings.

Code of Federal Regulations, 2011 CFR

2011-01-01

... 7 Agriculture 5 2011-01-01 2011-01-01 false Cleaning of imported seed and processing of certain... SCREENINGS UNDER THE FEDERAL SEED ACT § 361.8 Cleaning of imported seed and processing of certain Canadian... compliance agreement for the cleaning of imported seed or processing of otherwise prohibited screenings from...

Plasma processes for producing silanes and derivatives thereof

DOEpatents

Laine, Richard M; Massey, Dean Richard; Peterson, Peter Young

2014-03-25

The invention is generally related to process for generating one or more molecules having the formula Si.sub.xH.sub.y, Si.sub.xD.sub.y, Si.sub.xH.sub.yD.sub.z, and mixtures thereof, where x,y and z are integers .gtoreq.1, H is hydrogen and D is deuterium, such as silane, comprising the steps of: providing a silicon containing material, wherein the silicon containing material includes at least 20 weight percent silicon atoms based on the total weight of the silicon containing material; generating a plasma capable of vaporizing a silicon atom, sputtering a silicon atom, or both using a plasma generating device; and contacting the plasma to the silicon containing material in a chamber having an atmosphere that includes at least about 0.5 mole percent hydrogen atoms and/or deuterium atoms based on the total moles of atoms in the atmosphere; so that a molecule having the formula Si.sub.xH.sub.y; (e.g., silane) is generated. The process preferably includes a step of removing one or more impurities from the Si.sub.xH.sub.y (e.g., the silane) to form a clean Si.sub.xH.sub.y, Si.sub.xD.sub.y, Si.sub.xH.sub.yD.sub.z (e.g., silane). The process may also include a step of reacting the Si.sub.xH.sub.y, Si.sub.xD.sub.y, Si.sub.xH.sub.yD.sub.z (e.g., the silane) to produce a high purity silicon containing material such as electronic grade metallic silicon, photovoltaic grade metallic silicon, or both.

ASRM process development in aqueous cleaning

NASA Technical Reports Server (NTRS)

Swisher, Bill

1992-01-01

Viewgraphs are included on process development in aqueous cleaning which is taking place at the Aerojet Advanced Solid Rocket Motor (ASRM) Division under a NASA Marshall Space and Flight Center contract for design, development, test, and evaluation of the ASRM including new production facilities. The ASRM will utilize aqueous cleaning in several manufacturing process steps to clean case segments, nozzle metal components, and igniter closures. ASRM manufacturing process development is underway, including agent selection, agent characterization, subscale process optimization, bonding verification, and scale-up validation. Process parameters are currently being tested for optimization utilizing a Taguci Matrix, including agent concentration, cleaning solution temperature, agitation and immersion time, rinse water amount and temperature, and use/non-use of drying air. Based on results of process development testing to date, several observations are offered: aqueous cleaning appears effective for steels and SermeTel-coated metals in ASRM processing; aqueous cleaning agents may stain and/or attack bare aluminum metals to various extents; aqueous cleaning appears unsuitable for thermal sprayed aluminum-coated steel; aqueous cleaning appears to adequately remove a wide range of contaminants from flat metal surfaces, but supplementary assistance may be needed to remove clumps of tenacious contaminants embedded in holes, etc.; and hot rinse water appears to be beneficial to aid in drying of bare steel and retarding oxidation rate.

Optimization of the cleaning process on a pilot filtration setup for waste water treatment accompanied by flow visualization

NASA Astrophysics Data System (ADS)

Bílek, Petr; Hrůza, Jakub

2018-06-01

This paper deals with an optimization of the cleaning process on a liquid flat-sheet filter accompanied by visualization of the inlet side of a filter. The cleaning process has a crucial impact on the hydrodynamic properties of flat-sheet filters. Cleaning methods avoid depositing of particles on the filter surface and forming a filtration cake. Visualization significantly helps to optimize the cleaning methods, because it brings new overall view on the filtration process in time. The optical method, described in the article, enables to see flow behaviour in a thin laser sheet on the inlet side of a tested filter during the cleaning process. Visualization is a strong tool for investigation of the processes on filters in details and it is also possible to determine concentration of particles after an image analysis. The impact of air flow rate, inverse pressure drop and duration on the cleaning mechanism is investigated in the article. Images of the cleaning process are compared to the hydrodynamic data. The tests are carried out on a pilot filtration setup for waste water treatment.

Structural changes in lymphocytes membrane of Chernobyl clean-up workers from Latvia.

PubMed

Kalnina, Inta; Zvagule, Tija; Gabruseva, Natalija; Kirilova, Jelena; Kurjane, Natalja; Bruvere, Ruta; Kesters, Andris; Kizane, Gunta; Kirilovs, Georgijs; Meirovics, Imants

2007-11-01

ABM (3-aminobenzanthrrone derivative) developed at the Riga Technical University, Riga, Latvia) has been previously shown as a potential probe for determination of the immune state of patients with different pathologies . The fist study (using probe ABM) of peripheral blood mononuclear cells (PBMC) membranes of 97 Chernobyl clean-up workers from Latvia was conducted in 1997. Now we repeatedly examine the same (n = 54) individuals in dynamics. ABM spectral parameters in PBMC suspension, fluorescence anisotropy and blood plasma albumin characteristics were recorded. In 1997 screening showed 5 different patterns of fluorescence spectra, from which in 2007 we obtained only two. These patterns of spectra had never been previously seen in healthy individuals or patients with tuberculosis, multiple sclerosis, rheumatoid arthritis, etc., examined by us. Patterns of ABM fluorescence spectra are associated with membrane anisotropy and conformational changes of blood plasma albumin. We observed that in dynamics 1997-2007 the lipid compartment of the membrane became more fluid while the lipid-protein interface became more rigid. The use of probe ANS and albumin auto-fluorescence allowed show conformational alterations in Chernobyl clean-up workers blood plasma. It is necessary to note that all investigated parameters significantly differ in observed groups of patients. These findings reinforce our understanding that that the cell membrane is a significant biological target of radiation. The role of the membrane in the expression and course of cell damage after radiation exposure must be considered. So ten years dynamic of PBMC membrane characteristics by ABM (spectral shift and anisotropy indexes) in Chernobyl clean-up workers reveal progressive trend toward certain resemblance with those of chronic B-cell lymphoid leukemia.

Regenerating using aqueous cleaners with ozone and electrolysis

NASA Technical Reports Server (NTRS)

Mcginness, Michael P.

1994-01-01

A new process converts organic oil and grease contaminates in used water based cleaners into synthetic surfactants. This permits the continued use of a cleaning solution long after it would have been dumped using previously known methods. Since the organic soils are converted from contaminates to cleaning compounds the need for frequent bath dumps is totally eliminated. When cleaning solutions used in aqueous cleaning systems are exhausted and ready for disposal, they will always contain the contaminates removed from the cleaned parts and drag-in from prior cleaning steps. Even when the cleaner is biodegradable these contaminants will frequently cause the waste cleaning solution to be a hazardous waste. Chlorinated solvents are rapidly being replaced by aqueous cleaners to avoid the new ozone-depletion product-labeling-law. Many industry standard halocarbon based solvents are being completely phased out of production, and their prices have nearly tripled. Waste disposal costs and cradle-to-grave liability are also major concerns for industry today. This new process reduces the amount of water and chemicals needed to maintain the cleaning process. The cost of waste disposal is eliminated because the water and cleaning compounds are reused. Energy savings result by eliminating the need for energy currently used to produce and deliver fresh water and chemicals as well as the energy used to treat and destroy the waste from the existing cleaning processes. This process also allows the cleaning bath to be maintained at the peak performance of a new bath resulting in decreased cycle times and decreased energy consumption needed to clean the parts. This results in a more efficient and cost effective cleaning process.

Phase 2 of the array automated assembly task for the low cost solar array project

NASA Technical Reports Server (NTRS)

Campbell, R. B.; Davis, J. R.; Ostroski, J. W.; Rai-Choudhury, P.; Rohatgi, A.; Seman, E. J.; Stapleton, R. E.

1979-01-01

The process sequence for the fabrication of dendritic web silicon into solar panels was modified to include aluminum back surface field formation. Plasma etching was found to be a feasible technique for pre-diffusion cleaning of the web. Several contacting systems were studied. The total plated Pd-Ni system was not compatible with the process sequence; however, the evaporated TiPd-electroplated Cu system was shown stable under life testing. Ultrasonic bonding parameters were determined for various interconnect and contact metals but the yield of the process was not sufficiently high to use for module fabrication at this time. Over 400 solar cells were fabricated according to the modified sequence. No sub-process incompatibility was seen. These cells were used to fabricate four demonstration modules. A cost analysis of the modified process sequence resulted in a selling price of $0.75/peak watt.

Carbon Nanotube Bonding Strength Enhancement Using Metal "Wicking" Process

NASA Technical Reports Server (NTRS)

Lamb, James L.; Dickie, Matthew R.; Kowalczyk, Robert S.; Liao, Anna; Bronikowski, Michael J.

2012-01-01

Carbon nanotubes grown from a surface typically have poor bonding strength at the interface. A process has been developed for adding a metal coat to the surface of carbon nano tubes (CNTs) through a wicking process, which could lead to an enhanced bonding strength at the interface. This process involves merging CNTs with indium as a bump-bonding enhancement. Classical capillary theory would not normally allow materials that do not wet carbon or graphite to be drawn into the spacings by capillary action because the contact angle is greater than 90 degrees. However, capillary action can be induced through JPL's ability to fabricate oriented CNT bundles to desired spacings, and through the use of deposition techniques and temperature to control the size and mobility of the liquid metal streams and associated reservoirs. A reflow and plasma cleaning process has also been developed and demonstrated to remove indium oxide, and to obtain smooth coatings on the CNT bundles.

Stability of whole inactivated influenza virus vaccine during coating onto metal microneedles

PubMed Central

Choi, Hyo-Jick; Bondy, Brian J.; Yoo, Dae-Goon; Compans, Richard W.; Kang, Sang-Moo; Prausnitz, Mark R.

2012-01-01

Immunization using a microneedle patch coated with vaccine offers the promise of simplified vaccination logistics and increased vaccine immunogenicity. This study examined the stability of influenza vaccine during the microneedle coating process, with a focus on the role of coating formulation excipients. Thick, uniform coatings were obtained using coating formulations containing a viscosity enhancer and surfactant, but these formulations retained little functional vaccine hemagglutinin (HA) activity after coating. Vaccine coating in a trehalose-only formulation retained about 40 – 50% of vaccine activity, which is a significant improvement. The partial viral activity loss observed in the trehalose-only formulation was hypothesized to come from osmotic pressure-induced vaccine destabilization. We found that inclusion of a viscosity enhancer, carboxymethyl cellulose, overcame this effect and retained full vaccine activity on both washed and plasma-cleaned titanium surfaces. The addition of polymeric surfactant, Lutrol® micro 68, to the trehalose formulation generated phase transformations of the vaccine coating, such as crystallization and phase separation, which was correlated to additional vaccine activity loss, especially when coating on hydrophilic, plasma-cleaned titanium. Again, the addition of a viscosity enhancer suppressed the surfactant-induced phase transformations during drying, which was confirmed by in vivo assessment of antibody response and survival rate after immunization in mice. We conclude that trehalose and a viscosity enhancer are beneficial coating excipients, but the inclusion of surfactant is detrimental to vaccine stability. PMID:23246470

High-power hybrid plasma spraying of large yttria-stabilized zirconia powder

NASA Astrophysics Data System (ADS)

Huang, Heji; Eguchi, Keisuke; Yoshida, Toyonobu

2006-03-01

To testify to the advantage of large ceramic powder spraying, numerical simulations and experimental studies on the behavior of large yttria-stabilized zirconia (YSZ) powder in a high-power hybrid plasma spraying process have been carried out. Numeric predictions and experimental results showed that, with the high radio frequency (RF) input power of 100 kW, the most refractory YSZ powder with particle sizes as large as 88 μm could be fully melted and well-flattened splats could be formed. A large degree of flattening (ξ) of 4.7 has been achieved. The improved adhesive strength between the large splat and the substrate was confirmed based on the measurement of the crack density inside of the splats. A thick YSZ coating >300 μm was successfully deposited on a large CoNiCrAlY-coated Inconel substrate (50×50×4 mm in size). The ultradense microstructure without clear boundaries between the splats and the clean and crack-free interface between the top-coat and the bond-coat also indicate the good adhesion. These results showed that highpower hybrid plasma spraying of large ceramic powder is a very promising process for deposition of highquality coatings, especially in the application of thermal barrier coatings (TBCs).

An Innovative Method for Manufacturing Gamma-TiAl Foil

NASA Technical Reports Server (NTRS)

Hales, Stephen J.; Saqib, Mohammad; Alexa, Joel A.

2003-01-01

The manufacture and entrance into service of thin gage gamma-TiAl product has been hampered by the inherent low room temperature ductility of the material. In the present study a new approach was explored for the efficient manufacture of gamma-TiAl foil with improved ductility. The objective was to produce a very clean material (low interstitial content) with a highly refined, homogeneous microstructure placed in a fully lamellar condition. The processing route involved the use of RF plasma spray deposition of pre-alloyed powders, followed by consolidation via vacuum hot pressing and heat treatment. The approach took advantage of a deposition process which included no electrodes, no binders and high cooling rates. Results and discussion of the work performed to date are presented.

VUV absorption spectroscopy of bacterial spores and DNA components

NASA Astrophysics Data System (ADS)

Fiebrandt, Marcel; Lackmann, Jan-Wilm; Raguse, Marina; Moeller, Ralf; Awakowicz, Peter; Stapelmann, Katharina

2017-01-01

Low-pressure plasmas can be used to inactivate bacterial spores and sterilize goods for medical and pharmaceutical applications. A crucial factor are damages induced by UV and VUV radiation emitted by the plasma. To analyze inactivation processes and protection strategies of spores, absorption spectra of two B. subtilis strains are measured. The results indicate, that the inner and outer coat of the spore significantly contribute to the absorption of UV-C and also of the VUV, protecting the spore against radiation based damages. As the sample preparation can significantly influence the absorption spectra due to salt residues, the cleaning procedure and sample deposition is tested for its reproducibility by measuring DNA oligomers and pUC18 plasmid DNA. The measurements are compared and discussed with results from the literature, showing a strong decrease of the salt content enabling the detection of absorption structures in the samples.

Impact of different cleaning processes on the laser damage threshold of antireflection coatings for Z-Backlighter optics at Sandia National Laboratories

DOE Office of Scientific and Technical Information (OSTI.GOV)

Field, Ella; Bellum, John; Kletecka, Damon

We have examined how different cleaning processes affect the laser-induced damage threshold of antireflection coatings for large dimension, Z-Backlighter laser optics at Sandia National Laboratories. Laser damage thresholds were measured after the coatings were created, and again 4 months later to determine which cleaning processes were most effective. There is a nearly twofold increase in laser-induced damage threshold between the antireflection coatings that were cleaned and those that were not cleaned. Aging of the coatings after 4 months resulted in even higher laser-induced damage thresholds. Also, the laser-induced damage threshold results revealed that every antireflection coating had a high defectmore » density, despite the cleaning process used, which indicates that improvements to either the cleaning or deposition processes should provide even higher laser-induced damage thresholds.« less

Impact of different cleaning processes on the laser damage threshold of antireflection coatings for Z-Backlighter optics at Sandia National Laboratories

DOE PAGES

Field, Ella; Bellum, John; Kletecka, Damon

2014-11-06

We have examined how different cleaning processes affect the laser-induced damage threshold of antireflection coatings for large dimension, Z-Backlighter laser optics at Sandia National Laboratories. Laser damage thresholds were measured after the coatings were created, and again 4 months later to determine which cleaning processes were most effective. There is a nearly twofold increase in laser-induced damage threshold between the antireflection coatings that were cleaned and those that were not cleaned. Aging of the coatings after 4 months resulted in even higher laser-induced damage thresholds. Also, the laser-induced damage threshold results revealed that every antireflection coating had a high defectmore » density, despite the cleaning process used, which indicates that improvements to either the cleaning or deposition processes should provide even higher laser-induced damage thresholds.« less

Improving Overall Equipment Effectiveness Using CPM and MOST: A Case Study of an Indonesian Pharmaceutical Company

NASA Astrophysics Data System (ADS)

Omega, Dousmaris; Andika, Aditya

2017-12-01

This paper discusses the results of a research conducted on the production process of an Indonesian pharmaceutical company. The company is experiencing low performance in the Overall Equipment Effectiveness (OEE) metric. The OEE of the company machines are below world class standard. The machine that has the lowest OEE is the filler machine. Through observation and analysis, it is found that the cleaning process of the filler machine consumes significant amount of time. The long duration of the cleaning process happens because there is no structured division of jobs between cleaning operators, differences in operators’ ability, and operators’ inability in utilizing available cleaning equipment. The company needs to improve the cleaning process. Therefore, Critical Path Method (CPM) analysis is conducted to find out what activities are critical in order to shorten and simplify the cleaning process in the division of tasks. Afterwards, The Maynard Operation and Sequence Technique (MOST) method is used to reduce ineffective movement and specify the cleaning process standard time. From CPM and MOST, it is obtained the shortest time of the cleaning process is 1 hour 28 minutes and the standard time is 1 hour 38.826 minutes.

Sterilization of bacterial endospores by an atmospheric-pressure argon plasma jet

DOE Office of Scientific and Technical Information (OSTI.GOV)

Uhm, Han S.; Lim, Jin P.; Li, Shou Z.

2007-06-25

Argon plasma jets penetrate deep into ambient air and create a path for oxygen radicals to sterilize microbes. A sterilization experiment with bacterial endospores indicates that an argon-oxygen plasma jet very effectively kills endospores of Bacillus atrophaeus (ATCC 9372), thereby demonstrating its capability to clean surfaces and its usefulness for reinstating contaminated equipment as free from toxic biological warfare agents. However, the spore-killing efficiency of the atmospheric-pressure argon-oxygen jet depends very sensitively on the oxygen concentration in the argon gas.

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

PubMed Central

Belić, Domagoj; Shawrav, Mostafa M; Bertagnolli, Emmerich

2017-01-01

This work presents a highly effective approach for the chemical purification of directly written 2D and 3D gold nanostructures suitable for plasmonics, biomolecule immobilisation, and nanoelectronics. Gold nano- and microstructures can be fabricated by one-step direct-write lithography process using focused electron beam induced deposition (FEBID). Typically, as-deposited gold nanostructures suffer from a low Au content and unacceptably high carbon contamination. We show that the undesirable carbon contamination can be diminished using a two-step process – a combination of optimized deposition followed by appropriate postdeposition cleaning. Starting from the common metal-organic precursor Me2-Au-tfac, it is demonstrated that the Au content in pristine FEBID nanostructures can be increased from 30 atom % to as much as 72 atom %, depending on the sustained electron beam dose. As a second step, oxygen-plasma treatment is established to further enhance the Au content in the structures, while preserving their morphology to a high degree. This two-step process represents a simple, feasible and high-throughput method for direct writing of purer gold nanostructures that can enable their future use for demanding applications. PMID:29259868

Use of Synthetic Single-Stranded Oligonucleotides as Artificial Test Soiling for Validation of Surgical Instrument Cleaning Processes

PubMed Central

Wilhelm, Nadja; Perle, Nadja; Simmoteit, Robert; Schlensak, Christian; Wendel, Hans P.; Avci-Adali, Meltem

2014-01-01

Surgical instruments are often strongly contaminated with patients' blood and tissues, possibly containing pathogens. The reuse of contaminated instruments without adequate cleaning and sterilization can cause postoperative inflammation and the transmission of infectious diseases from one patient to another. Thus, based on the stringent sterility requirements, the development of highly efficient, validated cleaning processes is necessary. Here, we use for the first time synthetic single-stranded DNA (ssDNA_ODN), which does not appear in nature, as a test soiling to evaluate the cleaning efficiency of routine washing processes. Stainless steel test objects were coated with a certain amount of ssDNA_ODN. After cleaning, the amount of residual ssDNA_ODN on the test objects was determined using quantitative real-time PCR. The established method is highly specific and sensitive, with a detection limit of 20 fg, and enables the determination of the cleaning efficiency of medical cleaning processes under different conditions to obtain optimal settings for the effective cleaning and sterilization of instruments. The use of this highly sensitive method for the validation of cleaning processes can prevent, to a significant extent, the insufficient cleaning of surgical instruments and thus the transmission of pathogens to patients. PMID:24672793

Creating space plasma from the ground

NASA Astrophysics Data System (ADS)

Carlson, H. C.; Djuth, F. T.; Zhang, L. D.

2017-01-01

We have performed an experiment to compare as directly as realizable the ionization production rate by HF radio wave energy versus by solar EUV. We take advantage of the commonality that ionization production by both ground-based high-power HF radio waves and by solar EUV is driven by primary and secondary suprathermal electrons near and above 20 eV. Incoherent scatter radar (ISR) plasma-line amplitudes are used as a measure of suprathermal electron fluxes for ISR wavelengths near those for 430 MHz and are indeed a clean measure of such for those fluxes sufficiently weak to have negligible self-damping. We present data from an HF heating experiment on November 2015 at Arecibo, which even more directly confirm the only prior midlatitude estimate, of order 10% efficiency for conversion of HF energy to ionospheric ionization. We note the theoretical maximum possible is 1/3, while 1% or less reduces the question to near practical irrelevance. Our measurements explicitly confirm the prediction that radio-frequency production of artificial ionospheres can be practicable, even at midlatitudes. Furthermore, that this midlatitude efficiency is comparable to efficiencies measured at high latitudes (which include enhancements unique to high latitudes including magnetic zenith effect, gyrofrequency multiples, and double resonances) requires reexamination of current theoretical thinking about soft-electron acceleration processes in weakly magnetized plasmas. The implications are that electron acceleration by any of a variety of processes may be a fundamental underpinning to energy redistribution in space plasmas.

Method of processing a substrate

DOEpatents

Babayan, Steven E [Huntington Beach, CA; Hicks, Robert F [Los Angeles, CA

2008-02-12

The invention is embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and a substrate or work piece is placed in the gas flow downstream of the electrodes, such that said substrate or work piece is substantially uniformly contacted across a large surface area with the reactive gases emanating therefrom. The invention is also embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and one of the grounded electrodes contains a means of mixing in other chemical precursors to combine with the plasma stream, and a substrate or work piece placed in the gas flow downstream of the electrodes, such that said substrate or work piece is contacted by the reactive gases emanating therefrom. In one embodiment, the plasma flow device removes organic materials from a substrate or work piece, and is a stripping or cleaning device. In another embodiment, the plasma flow device kills biological microorganisms on a substrate or work piece, and is a sterilization device. In another embodiment, the plasma flow device activates the surface of a substrate or work piece, and is a surface activation device. In another embodiment, the plasma flow device etches materials from a substrate or work piece, and is a plasma etcher. In another embodiment, the plasma flow device deposits thin films onto a substrate or work piece, and is a plasma-enhanced chemical vapor deposition device or reactor.

Cleaning process for EUV optical substrates

DOEpatents

Weber, Frank J.; Spiller, Eberhard A.

1999-01-01

A cleaning process for surfaces with very demanding cleanliness requirements, such as extreme-ultraviolet (EUV) optical substrates. Proper cleaning of optical substrates prior to applying reflective coatings thereon is very critical in the fabrication of the reflective optics used in EUV lithographic systems, for example. The cleaning process involves ultrasonic cleaning in acetone, methanol, and a pH neutral soap, such as FL-70, followed by rinsing in de-ionized water and drying with dry filtered nitrogen in conjunction with a spin-rinse.

40 CFR 423.11 - Specialized definitions.

Code of Federal Regulations, 2012 CFR

2012-07-01

... air conditioning wastes are not included. (c) The term chemical metal cleaning waste means any wastewater resulting from the cleaning of any metal process equipment with chemical compounds, including, but... from cleaning [with or without chemical cleaning compounds] any metal process equipment including, but...

Development of CFC-Free Cleaning Processes at the NASA White Sands Test Facility

NASA Technical Reports Server (NTRS)

Beeson, Harold; Kirsch, Mike; Hornung, Steven; Biesinger, Paul

1995-01-01

The NASA White Sands Test Facility (WSTF) is developing cleaning and verification processes to replace currently used chlorofluorocarbon-113- (CFC-113-) based processes. The processes being evaluated include both aqueous- and solvent-based techniques. The presentation will include the findings of investigations of aqueous cleaning and verification processes that are based on a draft of a proposed NASA Kennedy Space Center (KSC) cleaning procedure. Verification testing with known contaminants, such as hydraulic fluid and commonly used oils, established correlations between nonvolatile residue and CFC-113. Recoveries ranged from 35 to 60 percent of theoretical. WSTF is also investigating enhancements to aqueous sampling for organics and particulates. Although aqueous alternatives have been identified for several processes, a need still exists for nonaqueous solvent cleaning, such as the cleaning and cleanliness verification of gauges used for oxygen service. The cleaning effectiveness of tetrachloroethylene (PCE), trichloroethylene (TCE), ethanol, hydrochlorofluorocarbon-225 (HCFC-225), tert-butylmethylether, and n-Hexane was evaluated using aerospace gauges and precision instruments and then compared to the cleaning effectiveness of CFC-113. Solvents considered for use in oxygen systems were also tested for oxygen compatibility using high-pressure oxygen autoignition and liquid oxygen mechanical impact testing.

Precision Cleaning and Verification Processes Used at Marshall Space Flight Center for Critical Hardware Applications

NASA Technical Reports Server (NTRS)

Caruso, Salvadore V.; Cox, Jack A.; McGee, Kathleen A.

1998-01-01

Marshall Space Flight Center (MSFC) of the National Aeronautics and Space Administration performs many research and development programs that require hardware and assemblies to be cleaned to levels that are compatible with fuels and oxidizers (liquid oxygen, solid propellants, etc.). Also, MSFC is responsible for developing large telescope satellites which require a variety of optical systems to be cleaned. A precision cleaning shop is operated within MSFC by the Fabrication Services Division of the Materials & Processes Laboratory. Verification of cleanliness is performed for all precision cleaned articles in the Environmental and Analytical Chemistry Branch. Since the Montreal Protocol was instituted, MSFC had to find substitutes for many materials that have been in use for many years, including cleaning agents and organic solvents. As MSFC is a research center, there is a great variety of hardware that is processed in the Precision Cleaning Shop. This entails the use of many different chemicals and solvents, depending on the nature and configuration of the hardware and softgoods being cleaned. A review of the manufacturing cleaning and verification processes, cleaning materials and solvents used at MSFC and changes that resulted from the Montreal Protocol will be presented.

Precision Cleaning and Verification Processes Used at Marshall Space Flight Center for Critical Hardware Applications

NASA Technical Reports Server (NTRS)

Caruso, Salvadore V.

1999-01-01

Marshall Space Flight Center (MSFC) of the National Aeronautics and Space Administration (NASA) performs many research and development programs that require hardware and assemblies to be cleaned to levels that are compatible with fuels and oxidizers (liquid oxygen, solid propellants, etc.). Also, the Center is responsible for developing large telescope satellites which requires a variety of optical systems to be cleaned. A precision cleaning shop is operated with-in MSFC by the Fabrication Services Division of the Materials & Processes Division. Verification of cleanliness is performed for all precision cleaned articles in the Analytical Chemistry Branch. Since the Montreal Protocol was instituted, MSFC had to find substitutes for many materials that has been in use for many years, including cleaning agents and organic solvents. As MSFC is a research Center, there is a great variety of hardware that is processed in the Precision Cleaning Shop. This entails the use of many different chemicals and solvents, depending on the nature and configuration of the hardware and softgoods being cleaned. A review of the manufacturing cleaning and verification processes, cleaning materials and solvents used at MSFC and changes that resulted from the Montreal Protocol will be presented.

Preliminary Results of Cleaning Process for Lubricant Contamination

NASA Astrophysics Data System (ADS)

Eisenmann, D.; Brasche, L.; Lopez, R.

2006-03-01

Fluorescent penetrant inspection (FPI) is widely used for aviation and other components for surface-breaking crack detection. As with all inspection methods, adherence to the process parameters is critical to the successful detection of defects. Prior to FPI, components are cleaned using a variety of cleaning methods which are selected based on the alloy and the soil types which must be removed. It is also important that the cleaning process not adversely affect the FPI process. There are a variety of lubricants and surface coatings used in the aviation industry which must be removed prior to FPI. To assess the effectiveness of typical cleaning processes on removal of these contaminants, a study was initiated at an airline overhaul facility. Initial results of the cleaning study for lubricant contamination in nickel, titanium and aluminum alloys will be presented.

Evaluation Of Sludge Heel Dissolution Efficiency With Oxalic Acid Cleaning At Savannah River Site

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sudduth, Christie; Vitali, Jason; Keefer, Mark

The chemical cleaning process baseline strategy at the Savannah River Site was revised to improve efficiency during future execution of the process based on lessons learned during previous bulk oxalic acid cleaning activities and to account for operational constraints imposed by safety basis requirements. These improvements were also intended to transcend the difficulties that arise from waste removal in higher rheological yield stress sludge tanks. Tank 12 implemented this improved strategy and the bulk oxalic acid cleaning efforts concluded in July 2013. The Tank 12 radiological removal results were similar to previous bulk oxalic acid cleaning campaigns despite the factmore » that Tank 12 contained higher rheological yield stress sludge that would make removal more difficult than the sludge treated in previous cleaning campaigns. No appreciable oxalate precipitation occurred during the cleaning process in Tank 12 compared to previous campaigns, which aided in the net volume reduction of 75-80%. Overall, the controls established for Tank 12 provide a template for an improved cleaning process.« less

Studies of EUV contamination mitigation

NASA Astrophysics Data System (ADS)

Graham, Samual, Jr.; Malinowski, Michael E.; Steinhaus, Chip; Grunow, Philip A.; Klebanoff, Leonard E.

2002-07-01

Carbon contamination removal was investigated using remote RF-O2, RF-H2, and atomic hydrogen experiments. Samples consisted of silicon wafers coated with 100 Angstrom sputtered carbon, as well as bare Si-capped Mo/Si optics. Samples were exposed to atomic hydrogen or RF plasma discharges at 100 W, 200 W, and 300 W. Carbon removal rate, optic oxidation rate, at-wavelength (13.4 nm) peak reflectance, and optic surface roughness were characterized. Data show that RF- O2 removes carbon at a rate approximately 6 times faster RF- H2 for a given discharge power. However, both cleaning techniques induce Mo/Si optic degradation through the loss of reflectivity associated with surface oxide growth for RF-O2 and an unknown mechanism with hydrogen cleaning. Atomic hydrogen cleaning shows carbon removal rates sufficient for use as an in-situ cleaning strategy for EUVoptics with less risk of optic degradation from overexposures than RF-discharge cleaning. While hydrogen cleaning (RF and atomic) of EUV optics has proven effective in carbon removal, attempts to dissociate hydrogen in co-exposures with EUV radiation have resulted in no detectable removal of carbon contamination.

Cleaning Processes across NASA Centers

NASA Technical Reports Server (NTRS)

Hammond, John M.

2010-01-01

All significant surfaces of the hardware must be pre-cleaned to remove dirt, grit, scale, corrosion, grease, oil and other foreign matter prior to any final precision cleaning process. Metallic parts shall be surface treated (cleaned, passivated, pickled and/or coated) as necessary to prevent latent corrosion and contamination.

Diagnostics for a waste processing plasma arc furnace (invited) (abstract)a)

NASA Astrophysics Data System (ADS)

Woskov, P. P.

1995-01-01

Maintaining the quality of our environment has become an important goal of society. As part of this goal new technologies are being sought to clean up hazardous waste sites and to treat ongoing waste streams. A 1 MW pilot scale dc graphite electrode plasma arc furnace (Mark II) has been constructed at MIT under a joint program among Pacific Northwest Laboratory (PNL), MIT, and Electro-Pyrolysis, Inc. (EPI)c) for the remediation of buried wastes in the DOE complex. A key part of this program is the development of new and improved diagnostics to study, monitor, and control the entire waste remediation process for the optimization of this technology and to safeguard the environment. Continuous, real time diagnostics are needed for a variety of the waste process parameters. These parameters include internal furnace temperatures, slag fill levels, trace metals content in the off-gas stream, off-gas molecular content, feed and slag characterization, and off-gas particulate size, density, and velocity distributions. Diagnostics are currently being tested at MIT for the first three parameters. An active millimeter-wave radiometer with a novel, rotatable graphite waveguide/mirror antenna system has been implemented on Mark II for the measurement of surface emission and emissivity which can be used to determine internal furnace temperatures and fill levels. A microwave torch plasma is being evaluated for use as a excitation source in the furnace off-gas stream for continuous atomic emission spectroscopy of trace metals. These diagnostics should find applicability not only to waste remediation, but also to other high temperature processes such as incinerators, power plants, and steel plants.

Nonthermal Biological Treatments Using Discharge Plasma Produced by Pulsed Power 4. Cleaning of Lakes and Marshes by Pulsed Power Produced Streamer Discharges in Water

NASA Astrophysics Data System (ADS)

Akiyama, Hidenori; Katsuki, Sunao; Namihira, Takao; Ishibashi, Kazuo; Kiyosaki, Noriaki

Pulsed power has been used to produce non-thermal plasmas in atmospheric pressure gases that generate a high electric field at the tips of streamer discharges, where high energy electrons, free radicals, ultraviolet rays, and ozone are produced. These manifestations of streamer discharges have been used in the treatment of exhaust gases, removal of volatile and toxic compounds such as dioxin, and the sterilization of microorganisms. Here, large volume streamer discharges in water are described. These streamer discharges in liquids are able to produce a high electric field, high energy electrons, ozone, chemically active species, ultraviolet rays, and shock waves, which readily sterilize microorganisms and decompose molecules and materials. An application of this phenomenon to the cleaning of lakes and marshes is also described.

Lack of specificity for the analysis of raltegravir using online sample clean-up liquid chromatography-electrospray tandem mass spectrometry.

PubMed

Jourdil, Jean François; Bartoli, Mireille; Stanke-Labesque, Françoise

2009-11-01

Raltegravir is the first antiretroviral agent to target the human immunodeficiency virus-1 (HIV-1) integrase. It is indicated, in association with other antiretrovirals, in the treatment of acquired immunodeficiency syndrome (AIDS) in antiretroviral treatment-experienced adult patients with viral resistance. To evaluate the feasibility of raltegravir therapeutic drug monitoring, we developed a rapid and specific analytical method for the quantification of raltegravir in human plasma by online sample clean-up liquid chromatography-tandem mass spectrometry (LC-MS/MS). After protein precipitation (with 100 microL of acetonitrile/methanol (50/50)) of 25 microL of plasma, fast online matrix-clean-up was performed using a column switching program. The chromatographic step was optimized to separate raltegravir and its glucuronide metabolite (G-raltegravir). Multiple reaction monitoring (MRM) was used for detection of raltegravir and G-raltegravir. In the absence of G-raltegravir standard, G-raltegravir identification was confirmed by beta-glucuronidase pre-treatment. A total analysis of 3.8 min was needed to separate raltegravir to G-raltegravir. The method was linear between 10 and 3000 ng/mL for raltegravir. Analytical recovery was 94+/-1%. Variation coefficients ranged between 5% and 8.4%. Pre-treatment of plasma from a patient under raltegravir treatment with beta-glucuronidase suppressed G-raltegravir peak. We describe a fast online LC-MS/MS assay that is valid and reliable for the quantification of raltegravir, despite the lack of specificity that could occur in MRM scanning mode experiments.

Post-ion beam induced degradation of copper layers in transmission electron microscopy specimens

NASA Astrophysics Data System (ADS)

Seidel, F.; Richard, O.; Bender, H.; Vandervorst, W.

2015-11-01

Copper containing transmission electron microscopy (TEM) specimens frequently show corrosion after focused ion beam (FIB) preparation. This paper reveals that the corrosion product is a Cu-S phase growing over the specimen surface. The layer is identified by energy-dispersive x-ray spectroscopy, and lattice spacing indexing of power spectra patterns. The corrosion process is further studied by TEM on cone-shaped specimens, which are intentionally stored after FIB preparation with S flakes for short time. Furthermore, a protective method against corrosion is developed by varying the time in the FIB vacuum and the duration of a subsequent plasma cleaning.

Evaluation of HCFC AK 225 Alternatives for Precision Cleaning and Verification

NASA Technical Reports Server (NTRS)

Melton, D. M.

1998-01-01

Maintaining qualified cleaning and verification processes are essential in an production environment. Environmental regulations have and are continuing to impact cleaning and verification processing in component and large structures, both at the Michoud Assembly Facility and component suppliers. The goal of the effort was to assure that the cleaning and verification proceeds unimpeded and that qualified, environmentally compliant material and process replacements are implemented and perform to specifications. The approach consisted of (1) selection of a Supersonic Gas-Liquid Cleaning System; (2) selection and evaluation of three cleaning and verification solvents as candidate alternatives to HCFC 225 (Vertrel 423 (HCFC), Vertrel MCA (HFC/1,2-Dichloroethylene), and HFE 7100DE (HFE/1,2 Dichloroethylene)); and evaluation of an analytical instrumental post cleaning verification technique. This document is presented in viewgraph format.

Effects of solution pH and electrical parameters on hydroxyapatite coatings deposited by a plasma-assisted electrophoresis technique.

PubMed

Nie, X; Leyland, A; Matthews, A; Jiang, J C; Meletis, E I

2001-12-15

Hydroxyapatite (HA) coatings can be deposited using a hybrid process of plasma electrolysis and electrophoresis, called plasma-assisted electrophoretic deposition (PEPD). HA aqueous suspensions with various pH values were prepared using a modified ultrasonic cleaning bath as an agitator/stirrer. Both DC and unbalanced AC power supplies were used to bias the titanium alloy substrate materials employed in this work. Scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffractometry (XRD), and Fourier transform infrared spectroscopy (FTIR) were used to observe and analyze coating morphology and microstructure. It was shown that the morphology and composition of the calcium phosphate coatings were significantly influenced by solution pH values; the level of "pure" HA in the coatings' composition corresponded to both solution pH and the type of power supply employed. Loss of hydroxyl radials (i.e., dehydroxylation), which degrades the performance of the hydroxyapatite coating in terms of long-term chemical and mechanical stability, can be virtually eliminated by a combination of high pH and unbalanced AC plasma power. In addition, the underlying TiO2 coatings used to support the HA layer (preproduced by plasma electrolysis process) have a nanoscaled (10-20 nm) polycrystalline structure. TEM studies also revealed a dense, continuous amorphous titania layer (10 nm in thickness) at the interface between the Ti alloy substrate and the TiO2 layer, which may play a role in improving the corrosion resistance of the substrate. Such a nanophase TiO2 layer (if used as a coating alone) may also provide a further improvement in osteoinductive properties, compared to a conventional TiO2 coating on the Ti alloy substrate. Copyright 2001 John Wiley & Sons, Inc. J Biomed Mater Res 57: 612-618, 2001

Clean-up and disposal process of polluted sediments from urban rivers.

PubMed

He, P J; Shao, L M; Gu, G W; Bian, C L; Xu, C

2001-10-01

In this paper, the discussion is concentrated on the properties of the polluted sediments and the combination of clean-up and disposal process for the upper layer heavily polluted sediments with good flowability. Based on the systematic analyses of various clean-up processes, a suitable engineering process has been evaluated and recommended. The process has been applied to the river reclamation in Yangpu District of Shanghai City, China. An improved centrifuge is used for dewatering the dredged sludge, which plays an important role in the combination of clean-up and disposal process. The assessment of the engineering process shows its environmental and technical economy feasibility, which is much better than that of traditional dredging-disposal processes.

Laser Ablation Cleaning of Self-Reacting Friction Stir Weld Seam Surfaces: A Preliminary Evaluation

NASA Technical Reports Server (NTRS)

Nunes, A. C., Jr.; Russell, C. K.; Brooke, S. A.; Parry, Q.; Lowrey, N. M.

2014-01-01

Anodized aluminum panels were cleaned by three lasers at three separate sites with a view to determining whether more economical laser cleaning might supplant current manual cleaning methods for preparation of surfaces to be welded by the self-reacting friction stir process. Uncleaned panels yielded welds exhibiting residual oxide defect (ROD) and failing at very low stresses along the trace of the weld seam. Manually cleaned panels yielded welds without ROD; these welds failed at nominal stress levels along an angled fracture surface not following the weld seam trace. Laser cleaned panels yielded welds failing at intermediate stress levels. The inadequacy of the laser cleaning processes leaves questions: Was the anodized aluminum test too stringent to represent actual cleaning requirements? Were the wrong laser cleaning techniques/parameters used for the study? Is the laser cleaning mechanism inadequate for effective preweld surface cleaning?

Development of a cleaning process for uranium chips machined with a glycol-water-borax coolant

DOE Office of Scientific and Technical Information (OSTI.GOV)

Taylor, P.A.

1984-12-01

A chip-cleaning process has been developed to remove the new glycol-water-borax coolant from oralloy chips. The process involves storing the freshly cut chips in Freon-TDF until they are cleaned, washing with water, and displacing the water with Freon-TDF. The wash water can be reused many times and still yield clean chips and then be added to the coolant to make up for evaporative losses. The Freon-TDF will be cycled by evaporation. The cleaning facility is currently being designed and should be operational by April 1985.

Characterization of laser-induced plasmas associated with energetic laser cleaning of metal particles on fused silica surfaces

DOE PAGES

Harris, Candace D.; Shen, Nan; Rubenchik, Alexander M.; ...

2015-11-04

Here, time-resolved plasma emission spectroscopy was used to characterize the energy coupling and temperature rise associated with single, 10-ns pulsed laser ablation of metallic particles bound to transparent substrates. Plasma associated with Fe(I) emission lines originating from steel microspheres was observed to cool from >24,000 to ~15,000 K over ~220 ns asmore » $$\\tau$$ -0.28, consistent with radiative losses and adiabatic gas expansion of a relatively free plasma. Simultaneous emission lines from Si(II) associated with the plasma etching of the SiO2 substrate were observed yielding higher plasma temperatures, ~35,000 K, relative to the Fe(I) plasma. Lastly, the difference in species temperatures is consistent with plasma confinement at the microsphere-substrate interface as the particle is ejected, and is directly visualized using pump-probe shadowgraphy as a function of pulsed laser energy.« less

40 CFR 423.11 - Specialized definitions.

Code of Federal Regulations, 2010 CFR

2010-07-01

... chemical metal cleaning waste means any wastewater resulting from the cleaning of any metal process equipment with chemical compounds, including, but not limited to, boiler tube cleaning. (d) The term metal cleaning waste means any wastewater resulting from cleaning [with or without chemical cleaning compounds...

40 CFR 423.11 - Specialized definitions.

Code of Federal Regulations, 2011 CFR

2011-07-01

... chemical metal cleaning waste means any wastewater resulting from the cleaning of any metal process equipment with chemical compounds, including, but not limited to, boiler tube cleaning. (d) The term metal cleaning waste means any wastewater resulting from cleaning [with or without chemical cleaning compounds...

[Cleaning and disinfection in nursing homes. Data on quality of structure, process and outcome in nursing homes in Frankfurt am Main, Germany, 2011].

PubMed

Heudorf, U; Gasteyer, S; Samoiski, Y; Voigt, K

2012-08-01

Due to the Infectious Disease Prevention Act, public health services in Germany are obliged to check the infection prevention in hospitals and other medical facilities as well as in nursing homes. In Frankfurt/Main, Germany, standardized control visits have been performed for many years. In 2011 focus was laid on cleaning and disinfection of surfaces. All 41 nursing homes were checked according to a standardized checklist covering quality of structure (i.e. staffing, hygiene concept), quality of process (observation of the cleaning processes in the homes) and quality of output, which was monitored by checking the cleaning of fluorescent marks which had been applied some days before and should have been removed via cleaning in the following days before the final check. In more than two thirds of the homes, cleaning personnel were salaried, in one third external personnel were hired. Of the homes 85% provided service clothing and all of them offered protective clothing. All homes had established hygiene and cleaning concepts, however, in 15% of the homes concepts for the handling of Norovirus and in 30% concepts for the handling of Clostridium difficile were missing. Regarding process quality only half of the processes observed, i.e. cleaning of hand contact surfaces, such as handrails, washing areas and bins, were correct. Only 44% of the cleaning controls were correct with enormous differences between the homes (0-100%). The correlation between quality of process and quality of output was significant. There was good quality of structure in the homes but regarding quality of process and outcome there was great need for improvement. This was especially due to faults in communication and coordination between cleaning personnel and nursing personnel. Quality outcome was neither associated with the number of the places for residents nor with staffing. Thus, not only quality of structure but also quality of process and outcome should be checked by the public health services.

An electrochemical and structural study of highly uniform tin oxide nanowires fabricated by a novel, scalable solvoplasma technique as anode material for sodium ion batteries

NASA Astrophysics Data System (ADS)

Mukherjee, Santanu; Schuppert, Nicholas; Bates, Alex; Jasinski, Jacek; Hong, Jong-Eun; Choi, Moon Jong; Park, Sam

2017-04-01

A novel solvoplasma based technique was used to fabricate highly uniform SnO2 nanowires (NWs) for application as an anode in sodium-ion batteries (SIBs). This technique is scalable, rapid, and utilizes a rigorous cleaning process to produce very pure SnO2 NWs with enhanced porosity; which improves sodium-ion hosting and reaction kinetics. The batch of NWs obtained from the plasma process were named the "as-made" sample and after cleaning the "pure" sample. Structural characterization showed that the as-made sample has a K+ ion impurity which is absent in the pure samples. The pure samples have a higher maximum specific capacity, 400.71 mAhg-1, and Coulombic efficiency, 85%, compared to the as-made samples which have a maximum specific capacity of 174.69 mAhg-1 and Coulombic efficiency of 74% upon cycling. A study of the electrochemical impedance spectra showed that the as-made samples have a higher interfacial and diffusion resistance than the pure samples and resistances increased after 50 cycles of cell operation for both samples due to progressive electrode degradation. Specific energy vs specific power plots were employed to analyze the performance of the system with respect to the working conditions.

Cleaning of parts for new manufacturing and parts rebuilding

NASA Astrophysics Data System (ADS)

Doherty, Jeff

1994-06-01

Parts cleaning is the largest single expense, and the most time consuming activity, in rebuilding and new manufacturing. On average, 25% to 40% of the total labor and overhead burden is spent on cleaning. EPA and OSHA pressures add to the burden by making some methods and chemicals obsolete. Some of the processes and chemicals in current use will be curtailed and or outlawed in the future. How can a shops and industries make long term decisions or capital investments in cleaning and process improvements when the government keeps changing its rules? At the MART Corporation in Saint Louis, Missouri, we manufacture a line of cabinet-style batch cleaning machines known as Power Washers. Twenty years ago MART invented and patented the Power Washer process, a cleaning method that recycles wash solution and blasts contaminates as they are washed off the more heavily contaminated parts. Since the initial invention MART has continued to R&D the washing process and develop ancillary systems that comply with EPA and OSHA regulations. For applications involving new industrial parts or items requiring specification cleaned surfaces. MART provides filtration and solution conditioning systems, part drying operations, and triple rinsing. Units are available in stainless steel or higher alloys. We are not alone in the washer manufacturing business. You have many choices of cleaning solutions (no pun intended) which will perform in your operations and yield good results. As a manufacturer, we are interested in your success with our equipment. We have all heard the horror stories of companies having selected inappropriate cleaning systems and or processes which then brought the company to its knees, production wise. Assembly, appearance, warranty, and performance shortcomings of finished products can often be directly related to the cleaning process and its shortcomings.

Determination of alpidem, an imidazopyridine anxiolytic, and its metabolites by column-switching high-performance liquid chromatography with fluorescence detection.

PubMed

Flaminio, L; Ripamonti, M; Ascalone, V

1994-05-13

Alpidem, 6-chloro-2-(4-chlorophenyl)-N,N-dipropylimidazo[1,2-a]pyridine- 3-acetamide, is an anxiolytic imidazopyridine that undergoes a first-pass elimination after oral administration to humans; it is actively metabolized and three circulating metabolites have been identified in plasma due to N-dealkylation, oxidation or a combination of both processes. For the determination of the unchanged drug and its metabolites in human plasma, a column-switching HPLC method was developed. The method, based on solid-phase extraction (performed on-line), involves the automatic injection of plasma samples (200 microliters) on to a precolumn filled with C18 material, clean-up of the sample with water in order to remove protein and salts and transfer of the analytes to the analytical column (after valve switching) by means of the mobile phase. All the processes were performed in the presence of an internal standard, a compound chemically related to alpidem. During the analytical chromatography, the precolumn was flushed with different solvents and after regeneration with water, it was ready for further injections. The analytical column was a C8 type and the mobile phase was acetonitrile-methanol-phosphate buffer solution (45:15:45, v/v/v) at a flow-rate of 1.5 ml min-1. The column was connected to a fluorimetric detector operating at excitation and emission wavelengths of 255 and 423 nm, respectively. The limits of quantitation of alpidem and three metabolites were 2.5 and 1.5 ng ml-1, respectively, in human plasma.

Contamination control methods for gases used in the microlithography process

NASA Astrophysics Data System (ADS)

Rabellino, Larry; Applegarth, Chuck; Vergani, Giorgio

2002-07-01

Sensitivity to contamination continues to increase as the technology shrinks from 365 nm I-line lamp illumination to 13.4 nm Extreme Ultraviolet laser activated plasma. Gas borne impurities can be readily distributed within the system, remaining both suspended in the gas and attached to critical surfaces. Effects from a variety of contamination, some well characterized and others not, remain a continuing obstacle for stepper manufacturers and users. Impurities like oxygen, moisture and hydrocarbons in parts per billion levels can absorb light, reducing the light intensity and subsequently reducing the consistence of the process. Moisture, sulfur compounds, ammonia, acid compounds and organic compounds such as hydrocarbons can deposit on lens or mirror surfaces affecting image quality. Regular lens replacement or removal for cleaning is a costly option and in-situ cleaning processes must be carefully managed to avoid recontamination of the system. The contamination can come from outside the controlled environment (local gas supply, piping system, & leaks), or from the materials moving into the controlled environment; or contamination may be generated inside the controlled environment as a result of the process itself. The release of amines can occur as a result of the degassing of the photo-resists. For the manufacturer and user of stepper equipment, the challenge is not in predictable contamination, but the variable or unpredictable contamination in the process. One type of unpredictable contamination may be variation in the environmental conditions when producing the nitrogen gas and Clean Dry Air (CDA). Variation in the CDA, nitrogen and xenon may range from parts per billion to parts per million. The risk due to uncontrolled or unmonitored variation in gas quality can be directly related to product defects. Global location can significantly affect the gas quality, due to the ambient air quality (for nitrogen and CDA), production methods, gas handling equipment maintenance, transportation and storage processes. Fortunately, technology has been developed which can remove the killer impurities from these processes. This paper will review processes, and purification media that can be used in the photolithography processes, and detail the advances in purification technologies for removal of hydrocarbons, oxygen (where applicable), moisture, carbon dioxide, carbon monoxide, hydrogen, nitrogen (where applicable), sulfur compounds, ammonia and acid compounds from process gases such as nitrogen, CDA, argon, krypton and xenon.

40 CFR 463.20 - Applicability; description of the cleaning water subcategory.

Code of Federal Regulations, 2014 CFR

2014-07-01

.... Processes in the cleaning water subcategory are processes where water comes in contact with the plastic product for the purpose of cleaning the surface of the product and where water comes in contact with...

40 CFR 463.20 - Applicability; description of the cleaning water subcategory.

Code of Federal Regulations, 2012 CFR

2012-07-01

.... Processes in the cleaning water subcategory are processes where water comes in contact with the plastic product for the purpose of cleaning the surface of the product and where water comes in contact with...

40 CFR 463.20 - Applicability; description of the cleaning water subcategory.

Code of Federal Regulations, 2013 CFR

2013-07-01

.... Processes in the cleaning water subcategory are processes where water comes in contact with the plastic product for the purpose of cleaning the surface of the product and where water comes in contact with...

Self-cleaning poly(dimethylsiloxane) film with functional micro/nano hierarchical structures.

PubMed

Zhang, Xiao-Sheng; Zhu, Fu-Yun; Han, Meng-Di; Sun, Xu-Ming; Peng, Xu-Hua; Zhang, Hai-Xia

2013-08-27

This paper reports a novel single-step wafer-level fabrication of superhydrophobic micro/nano dual-scale (MNDS) poly(dimethylsiloxane) (PDMS) films. The MNDS PDMS films were replicated directly from an ultralow-surface-energy silicon substrate at high temperature without any surfactant coating, achieving high precision. An improved deep reactive ion etching (DRIE) process with enhanced passivation steps was proposed to easily realize the ultralow-surface-energy MNDS silicon substrate and also utilized as a post-treatment process to strengthen the hydrophobicity of the MNDS PDMS film. The chemical modification of this enhanced passivation step to the surface energy has been studied by density functional theory, which is also the first investigation of C4F8 plasma treatment at molecular level by using first-principle calculations. From the results of a systematic study on the effect of key process parameters (i.e., baking temperature and time) on PDMS replication, insight into the interaction of hierarchical multiscale structures of polymeric materials during the micro/nano integrated fabrication process is experimentally obtained for the first time. Finite element simulation has been employed to illustrate this new phenomenon. Additionally, hierarchical PDMS pyramid arrays and V-shaped grooves have been developed and are intended for applications as functional structures for a light-absorption coating layer and directional transport of liquid droplets, respectively. This stable, self-cleaning PDMS film with functional micro/nano hierarchical structures, which is fabricated through a wafer-level single-step fabrication process using a reusable silicon mold, shows attractive potential for future applications in micro/nanodevices, especially in micro/nanofluidics.

Nb/Al-AlOx/Nb Edge Junctions for Distributed Mixers

NASA Astrophysics Data System (ADS)

Amos, R. S.; Lichtenberger, A. W.; Tong, C. E.; Blundell, R.; Pan, S.-K.; Kerr, A. R.

We have fabricated high quality Nb/Al-oxide/Al/Nb edge junctions using a Nb/SiO/sub 2/ bi-layer film as the base electrode, suitable for use as traveling wave mixers. An edge is cut in the bi-layer with an ion gun at a 45 degree angle using a photoresist mask. The wafer is then cleaned in-situ with a physical ion gun clean followed by the deposition of a thin Al (a1) film, which is then thermally oxidized, an optional second Al (a2) layer, and a Nb counter electrode. It was found that devices with an a2 layer resulted in superior electrical characteristics, though proximity effects increased strongly with a2 thickness. The counter electrode is defined with an SF/sub 6/+N/sub 2/ reactive ion etch, using the Al barrier layer as an etch stop. The Al barrier layer is then either removed with an Al wet etch to isolate the individual devices, or the devices are separated with an anodization process. Various ion gun cleaning conditions have been examined; in addition, both wet and plasma etch bi-layer edge surface pre-treatments were investigated. It was found that edge junctions with large widths (i.e., those more suitable for traveling wave mixers) typically benefited more from such treatments. Initial receiver results at 260 GHz have yielded a DSB noise temperature of 60 K.

Size and shape dependence of CO adsorption sites on sapphire supported Fe microcrystals

NASA Technical Reports Server (NTRS)

Papageorgopoulos, C.; Heinemann, K.

1985-01-01

The surface structure and stoichiometry of alumina substrates, as well as the size, growth characteristics, and shape of Fe deposits on sapphire substrates have been investigated by low energy electron diffraction (LEED), Auger electron spectroscopy, electron energy loss spectroscopy, and X-ray photoemission spectroscopy (XPS), as well as work function measurements, in conjunction with transition electron microscopy observations. The substrates used in this work were the following: (1) new, clean Al2O3; (2) same surface amorphized by Ar ion bombardment; (3) same surface regenerated by 650 C annealing; (4) amorphous alumina films on Ta slab; and (5) polycrystal alumina films, obtained by heating amorphous films to 600 C. Substrate cleaning was found to be most effective in producing a reproducible surface upon oxygen RF plasma treatment. The Fe nucleation and growth process was found to depend strongly on the type of substrate surface and deposition conditions. Ar ion bombardment under beam flooding, and subsequent annealing at 650 C was found an effective means to restore the original Al2O3 (1102) surface for renewed Fe deposition.

Cleaning conveyor belts in the chicken-cutting area of a poultry processing plant with 45°c water.

PubMed

Soares, V M; Pereira, J G; Zanette, C M; Nero, L A; Pinto, J P A N; Barcellos, V C; Bersot, L S

2014-03-01

Conveyor belts are widely used in food handling areas, especially in poultry processing plants. Because they are in direct contact with food and it is a requirement of the Brazilian health authority, conveyor belts are required to be continuously cleaned with hot water under pressure. The use of water in this procedure has been questioned based on the hypothesis that water may further disseminate microorganisms but not effectively reduce the organic material on the surface. Moreover, reducing the use of water in processing may contribute to a reduction in costs and emission of effluents. However, no consistent evidence in support of removing water during conveyor belt cleaning has been reported. Therefore, the objective of the present study was to compare the bacterial counts on conveyor belts that were or were not continuously cleaned with hot water under pressure. Superficial samples from conveyor belts (cleaned or not cleaned) were collected at three different times during operation (T1, after the preoperational cleaning [5 a.m.]; T2, after the first work shift [4 p.m.]; and T3, after the second work shift [1:30 a.m.]) in a poultry meat processing facility, and the samples were subjected to mesophilic and enterobacterial counts. For Enterobacteriaceae, no significant differences were observed between the conveyor belts, independent of the time of sampling or the cleaning process. No significant differences were observed between the counts of mesophilic bacteria at the distinct times of sampling on the conveyor belt that had not been subjected to continuous cleaning with water at 45°C. When comparing similar periods of sampling, no significant differences were observed between the mesophilic counts obtained from the conveyor belts that were or were not subjected to continuous cleaning with water at 45°C. Continuous cleaning with water did not significantly reduce microorganism counts, suggesting the possibility of discarding this procedure in chicken processing.

Development of environmentally conscious cleaning process for leadless chip carrier assemblies. Final report

DOE Office of Scientific and Technical Information (OSTI.GOV)

Adams, B.E.

1995-04-01

A cross-functional team of process, product, quality, material, and design lab engineers was assembled to develop an environmentally friendly cleaning process for leadless chip carrier assemblies (LCCAs). Using flush and filter testing, Auger surface analysis, GC-Mass spectrophotometry, production yield results, and electrical testing results over an extended testing period, the team developed an aqueous cleaning process for LCCAs. The aqueous process replaced the Freon vapor degreasing/ultrasonic rinse process.

Electric Characteristic Enhancement of an AZO/Si Schottky Barrier Diode with Hydrogen Plasma Surface Treatment and AlxOx Guard Ring Structure

PubMed Central

Li, Chien-Yu; Cheng, Min-Yu; Houng, Mau-Phon; Yang, Cheng-Fu; Liu, Jing

2018-01-01

In this study, the design and fabrication of AZO/n-Si Schottky barrier diodes (SBDs) with hydrogen plasma treatment on silicon surface and AlxOx guard ring were presented. The Si surface exhibited less interface defects after the cleaning process following with 30 w of H2 plasma treatment that improved the switching properties of the following formed SBDs. The rapid thermal annealing experiment also held at 400 °C to enhance the breakdown voltage of SBDs. The edge effect of the SBDs was also suppressed with the AlxOx guard ring structure deposited by the atomic layer deposition (ALD) at the side of the SBDs. Experimental results show that the reverse leakage current was reduced and the breakdown voltage increased with an addition of the AlxOx guard ring. The diode and fabrication technology developed in the study were applicable to the realization of SBDs with a high breakdown voltage (>200 V), a low reverse leakage current density (≤72 μA/mm2@100 V), and a Schottky barrier height of 1.074 eV. PMID:29316726

Electric Characteristic Enhancement of an AZO/Si Schottky Barrier Diode with Hydrogen Plasma Surface Treatment and AlxOx Guard Ring Structure.

PubMed

Li, Chien-Yu; Cheng, Min-Yu; Houng, Mau-Phon; Yang, Cheng-Fu; Liu, Jing

2018-01-08

In this study, the design and fabrication of AZO/n-Si Schottky barrier diodes (SBDs) with hydrogen plasma treatment on silicon surface and Al x O x guard ring were presented. The Si surface exhibited less interface defects after the cleaning process following with 30 w of H₂ plasma treatment that improved the switching properties of the following formed SBDs. The rapid thermal annealing experiment also held at 400 °C to enhance the breakdown voltage of SBDs. The edge effect of the SBDs was also suppressed with the Al x O x guard ring structure deposited by the atomic layer deposition (ALD) at the side of the SBDs. Experimental results show that the reverse leakage current was reduced and the breakdown voltage increased with an addition of the Al x O x guard ring. The diode and fabrication technology developed in the study were applicable to the realization of SBDs with a high breakdown voltage (>200 V), a low reverse leakage current density (≤72 μA/mm²@100 V), and a Schottky barrier height of 1.074 eV.

40 CFR 420.111 - Specialized definitions.

Code of Federal Regulations, 2012 CFR

2012-07-01

... AND STANDARDS IRON AND STEEL MANUFACTURING POINT SOURCE CATEGORY Alkaline Cleaning Subcategory § 420.111 Specialized definitions. (a) The term batch means those alkaline cleaning operations which process... continuous means those alkaline cleaning operations which process steel products other than in discrete...

40 CFR 420.111 - Specialized definitions.

Code of Federal Regulations, 2013 CFR

2013-07-01

... AND STANDARDS IRON AND STEEL MANUFACTURING POINT SOURCE CATEGORY Alkaline Cleaning Subcategory § 420.111 Specialized definitions. (a) The term batch means those alkaline cleaning operations which process... continuous means those alkaline cleaning operations which process steel products other than in discrete...

40 CFR 420.111 - Specialized definitions.

Code of Federal Regulations, 2014 CFR

2014-07-01

... AND STANDARDS IRON AND STEEL MANUFACTURING POINT SOURCE CATEGORY Alkaline Cleaning Subcategory § 420.111 Specialized definitions. (a) The term batch means those alkaline cleaning operations which process... continuous means those alkaline cleaning operations which process steel products other than in discrete...

MICROARRAY SYSTEM FOR CONTAMINATED WATER ANALYSIS

EPA Science Inventory

We used the optimum slide treatment as determined by the previous study*: water plasma cleaning, photo-hydrolytic weathering, and silane treatment using 3-aminopropyl triethoxysilane (APS). Anti-E.coli antibodies were printed onto Corning 2947 (soda-lime-silicate) ...

78 FR 24715 - Notice of Request for Extension of Approval of an Information Collection; Importation of Seed and...

Federal Register 2010, 2011, 2012, 2013, 2014

2013-04-26

.... 361.8 provides the regulations for the cleaning of imported seed and processing of certain Canadian... with Canada that allows U.S. companies that import seed for cleaning or processing to enter into... Canadian seed and screenings, seed cleaning/processing facility personnel, and Canadian Food Inspection...

40 CFR 423.11 - Specialized definitions.

Code of Federal Regulations, 2013 CFR

2013-07-01

... not included. (c) The term chemical metal cleaning waste means any wastewater resulting from the cleaning of any metal process equipment with chemical compounds, including, but not limited to, boiler tube... chemical cleaning compounds] any metal process equipment including, but not limited to, boiler tube...

40 CFR 423.11 - Specialized definitions.

Code of Federal Regulations, 2014 CFR

2014-07-01

... not included. (c) The term chemical metal cleaning waste means any wastewater resulting from the cleaning of any metal process equipment with chemical compounds, including, but not limited to, boiler tube... chemical cleaning compounds] any metal process equipment including, but not limited to, boiler tube...

Occupational deaths and injuries by the types of street cleaning process.

PubMed

Jeong, Byung Yong

2017-03-01

This study aims to obtain an overall picture of occupational injuries by the types of street cleaning process. Three hundred and fifty-four injured persons were analyzed in terms of the company size and details of the injured persons and accidents. Results show that 'roadway cleaning' was the most common type of cleaning process for injuries, followed by 'sidewalk cleaning,' 'going/returning to work by bike' and 'lifting/carrying.' The findings also show that most accidents which occur when 'going/returning to work by bike' are in the form of traffic accidents, while in other processes they happen most often in the form of slips. Most of the accidents related to 'lifting/carrying' affected workers in their 50s or younger while other processes had a large portion of injured persons in their 50s or older. The findings of this study can be used as baseline data for preventative policies.

Ultrasonic cleaning: Fundamental theory and application

NASA Technical Reports Server (NTRS)

Fuchs, F. John

1995-01-01

This presentation describes: the theory of ultrasonics, cavitation and implosion; the importance and application of ultrasonics in precision cleaning; explanations of ultrasonic cleaning equipment options and their application; process parameters for ultrasonic cleaning; and proper operation of ultrasonic cleaning equipment to achieve maximum results.

Porcelain-coated antenna for radio-frequency driven plasma source

DOEpatents

Leung, Ka-Ngo; Wells, Russell P.; Craven, Glen E.

1996-01-01

A new porcelain-enamel coated antenna creates a clean plasma for volume or surface-conversion ion sources. The porcelain-enamel coating is hard, electrically insulating, long lasting, non fragile, and resistant to puncture by high energy ions in the plasma. Plasma and ion production using the porcelain enamel coated antenna is uncontaminated with filament or extraneous metal ion because the porcelain does not evaporate and is not sputtered into the plasma during operation. Ion beams produced using the new porcelain-enamel coated antenna are useful in ion implantation, high energy accelerators, negative, positive, or neutral beam applications, fusion, and treatment of chemical or radioactive waste for disposal. For ion implantation, the appropriate species ion beam generated with the inventive antenna will penetrate large or small, irregularly shaped conducting objects with a narrow implantation profile.

Soft Tissue Response to Titanium Abutments with Different Surface Treatment: Preliminary Histologic Report of a Randomized Controlled Trial.

PubMed

Canullo, Luigi; Dehner, Jan Friedrich; Penarrocha, David; Checchi, Vittorio; Mazzoni, Annalisa; Breschi, Lorenzo

2016-01-01

The aim of this preliminary prospective RCT was to histologically evaluate peri-implant soft tissues around titanium abutments treated using different cleaning methods. Sixteen patients were randomized into three groups: laboratory customized abutments underwent Plasma of Argon treatment (Plasma Group), laboratory customized abutments underwent cleaning by steam (Steam Group), and abutments were used as they came from industry (Control Group). Seven days after the second surgery, soft tissues around abutments were harvested. Samples were histologically analyzed. Soft tissues surrounding Plasma Group abutments predominantly showed diffuse chronic infiltrate, almost no acute infiltrate, with presence of few polymorphonuclear neutrophil granulocytes, and a diffuse presence of collagenization bands. Similarly, in Steam Group, the histological analysis showed a high variability of inflammatory expression factors. Tissues harvested from Control Group showed presence of few neutrophil granulocytes, moderate presence of lymphocytes, and diffuse collagenization bands in some sections, while they showed absence of acute infiltrate in 40% of sections. However, no statistical difference was found among the tested groups for each parameter (p > 0.05). Within the limit of the present study, results showed no statistically significant difference concerning inflammation and healing tendency between test and control groups.

Nonthermal plasma reactors for treatment of NO{sub x} and other hazardous gas emissions

DOE Office of Scientific and Technical Information (OSTI.GOV)

Thomas, D.S.

1994-05-06

The 1990 Clean Air Act Amendments passed by the United States government has prompted a great deal of interest in reducing the amount of hazardous pollutants released into the air. Of particular interest to Lawrence Livermore National Laboratory is the reduction of NO{sub x} produced by mobile diesel engines. The use of nonthermal plasma technologies is employed in the effort to reduce the amount of toxins present in diesel exhaust.

The successful of finite element to invent particle cleaning system by air jet in hard disk drive

NASA Astrophysics Data System (ADS)

Jai-Ngam, Nualpun; Tangchaichit, Kaitfa

2018-02-01

Hard Disk Drive manufacturing has faced very challenging with the increasing demand of high capacity drives for Cloud-based storage. Particle adhesion has also become increasingly important in HDD to gain more reliability of storage capacity. The ability to clean on surfaces is more complicated in removing such particles without damaging the surface. This research is aim to improve the particle cleaning in HSA by using finite element to develop the air flow model then invent the prototype of air cleaning system to remove particle from surface. Surface cleaning by air pressure can be applied as alternative for the removal of solid particulate contaminants that is adhering on a solid surface. These technical and economic challenges have driven the process development from traditional way that chemical solvent cleaning. The focus of this study is to develop alternative way from scrub, ultrasonic, mega sonic on surface cleaning principles to serve as a foundation for the development of new processes to meet current state-of-the-art process requirements and minimize the waste from chemical cleaning for environment safety.

Determination of element/Ca ratios in foraminifera and corals using cold- and hot-plasma techniques in inductively coupled plasma sector field mass spectrometry

NASA Astrophysics Data System (ADS)

Lo, Li; Shen, Chuan-Chou; Lu, Chia-Jung; Chen, Yi-Chi; Chang, Ching-Chih; Wei, Kuo-Yen; Qu, Dingchuang; Gagan, Michael K.

2014-02-01

We have developed a rapid and precise procedure for measuring multiple elements in foraminifera and corals by inductively coupled plasma sector field mass spectrometry (ICP-SF-MS) with both cold- [800 W radio frequency (RF) power] and hot- (1200 W RF power) plasma techniques. Our quality control program includes careful subsampling protocols, contamination-free workbench spaces, and refined plastic-ware cleaning process. Element/Ca ratios are calculated directly from ion beam intensities of 24Mg, 27Al, 43Ca, 55Mn, 57Fe, 86Sr, and 138Ba, using a standard bracketing method. A routine measurement time is 3-5 min per dissolved sample. The matrix effects of nitric acid, and Ca and Sr levels, are carefully quantified and overcome. There is no significant difference between data determined by cold- and hot-plasma methods, but the techniques have different advantages. The cold-plasma technique offers a more stable plasma condition and better reproducibility for ppm-level elements. Long-term 2-sigma relative standard deviations (2-RSD) for repeat measurements of an in-house coral standard are 0.32% for Mg/Ca and 0.43% for Sr/Ca by cold-plasma ICP-SF-MS, and 0.69% for Mg/Ca and 0.51% for Sr/Ca by hot-plasma ICP-SF-MS. The higher sensitivity and enhanced measurement precision of the hot-plasma procedure yields 2-RSD precision for μmol/mol trace elements of 0.60% (Mg/Ca), 9.9% (Al/Ca), 0.68% (Mn/Ca), 2.7% (Fe/Ca), 0.50% (Sr/Ca), and 0.84% (Ba/Ca) for an in-house foraminiferal standard. Our refined ICP-SF-MS technique, which has the advantages of small sample size (2-4 μg carbonate consumed) and fast sample throughput (5-8 samples/hour), should open the way to the production of high precision and high resolution geochemical records for natural carbonate materials.

ArF halftone PSM cleaning process optimization for next-generation lithography

NASA Astrophysics Data System (ADS)

Son, Yong-Seok; Jeong, Seong-Ho; Kim, Jeong-Bae; Kim, Hong-Seok

2000-07-01

ArF lithography which is expected for the next generation optical lithography is adapted for 0.13 micrometers design-rule and beyond. ArF half-tone phase shift mask (HT PSM) will be applied as 1st generation of ArF lithography. Also ArF PSM cleaning demands by means of tighter controls related to phase angle, transmittance and contamination on the masks. Phase angle on ArF HT PSM should be controlled within at least +/- 3 degree and transmittance controlled within at least +/- 3 percent after cleaning process and pelliclization. In the cleaning process of HT PSM, requires not only the remove the particle on mask, but also control to half-tone material for metamorphosis. Contamination defects on the Qz of half tone type PSM is not easy to remove on the photomask surface. New technology and methods of cleaning will be developed in near future, but we try to get out for limit contamination on the mask, without variation of phase angle and transmittance after cleaning process.

Molecular-level removal of proteinaceous contamination from model surfaces and biomedical device materials by air plasma treatment.

PubMed

Banerjee, K K; Kumar, S; Bremmell, K E; Griesser, H J

2010-11-01

Established methods for cleaning and sterilising biomedical devices may achieve removal of bioburden only at the macroscopic level while leaving behind molecular levels of contamination (mainly proteinaceous). This is of particular concern if the residue might contain prions. We investigated at the molecular level the removal of model and real-life proteinaceous contamination from model and practical surfaces by air plasma (ionised air) treatment. The surface-sensitive technique of X-ray photoelectron spectroscopy (XPS) was used to assess the removal of proteinaceous contamination, with the nitrogen (N1s) photoelectron signal as its marker. Model proteinaceous contamination (bovine serum albumin) adsorbed on to a model surface (silicon wafer) and the residual proteinaceous contamination resulting from incubating surgical stainless steel (a practical biomaterial) in whole human blood exhibited strong N1s signals [16.8 and 18.5 atomic percent (at.%), respectively] after thorough washing. After 5min air plasma treatment, XPS detected no nitrogen on the sample surfaces, indicating complete removal of proteinaceous contamination, down to the estimated XPS detection limit 10ng/cm(2). Applying the same plasma treatment, the 7.7at.% nitrogen observed on a clinically cleaned dental bur was reduced to a level reflective of new, as-received burs. Contact angle measurements and atomic force microscopy also indicated complete molecular-level removal of the proteinaceous contamination upon air plasma treatment. This study demonstrates the effectiveness of air plasma treatment for removing proteinaceous contamination from both model and practical surfaces and offers a method for ensuring that no molecular residual contamination such as prions is transferred upon re-use of surgical and dental instruments. Crown Copyright © 2010. Published by Elsevier Ltd. All rights reserved.

Advanced lithographic filtration and contamination control for 14nm node and beyond semiconductor processes

NASA Astrophysics Data System (ADS)

Varanasi, Rao; Mesawich, Michael; Connor, Patrick; Johnson, Lawrence

2017-03-01

Two versions of a specific 2nm rated filter containing filtration medium and all other components produced from high density polyethylene (HDPE), one subjected to standard cleaning, the other to specialized ultra-cleaning, were evaluated in terms of their cleanliness characteristics, and also defectivity of wafers processed with photoresist filtered through each. With respect to inherent cleanliness, the ultraclean version exhibited a 70% reduction in total metal extractables and 90% reduction in organics extractables compared to the standard clean version. In terms of particulate cleanliness, the ultraclean version achieved stability of effluent particles 30nm and larger in about half the time required by the standard clean version, also exhibiting effluent levels at stability almost 90% lower. In evaluating defectivity of blanket wafers processed with photoresist filtered through either version, initial defect density while using the ultraclean version was about half that observed when the standard clean version was in service, with defectivity also falling more rapidly during subsequent usage of the ultraclean version compared to the standard clean version. Similar behavior was observed for patterned wafers, where the enhanced defect reduction was primarily of bridging defects. The filter evaluation and actual process-oriented results demonstrate the extreme value in using filtration designed possessing the optimal intrinsic characteristics, but with further improvements possible through enhanced cleaning processes

In situ dc oxygen‐discharge cleaning system for optical elements

DOE Office of Scientific and Technical Information (OSTI.GOV)

Koide, Tsuneharu; Shidara, Tetsuo; Tanaka, Kenichiro

1989-07-15

In situ dc oxygen‐discharge cleaning arrangements have been developed at the Photon Factory for the removal of carbon contamination from optical surfaces. A high cleaning rate could be achieved by producing an oxygen plasma close to the optical elements with special care taken to avoid any harmful effects from the discharge; contaminant carbon was completely removed within a few hours, at most. This short exposure time and the use of dry oxygen gas resulted in a restoration of the original ultrahigh vacuum without a bakeout. Results with a Seya‐Namioka beamline for gas‐phase experiments showed a flux enhancement amounting to amore » factor of 50, and results with a grasshopper beamline showed a nearly complete recovery of the light intensity, even at the carbon K edge.« less

Contamination Control and Hardware Processing Solutions at Marshall Space Flight Center

NASA Technical Reports Server (NTRS)

Burns, DeWitt H.; Hampton, Tammy; Huey, LaQuieta; Mitchell, Mark; Norwood, Joey; Lowrey, Nikki

2012-01-01

The Contamination Control Team of Marshall Space Flight Center's Materials and Processes Laboratory supports many Programs/ Projects that design, manufacture, and test a wide range of hardware types that are sensitive to contamination and foreign object damage (FOD). Examples where contamination/FOD concerns arise include sensitive structural bondline failure, critical orifice blockage, seal leakage, and reactive fluid compatibility (liquid oxygen, hydrazine) as well as performance degradation of sensitive instruments or spacecraft surfaces such as optical elements and thermal control systems. During the design phase, determination of the sensitivity of a hardware system to different types or levels of contamination/FOD is essential. A contamination control and FOD control plan must then be developed and implemented through all phases of ground processing, and, sometimes, on-orbit use, recovery, and refurbishment. Implementation of proper controls prevents cost and schedule impacts due to hardware damage or rework and helps assure mission success. Current capabilities are being used to support recent and on-going activities for multiple Mission Directorates / Programs such as International Space Station (ISS), James Webb Space Telescope (JWST), Space Launch System (SLS) elements (tanks, engines, booster), etc. The team also advances Green Technology initiatives and addresses materials obsolescence issues for NASA and external customers, most notably in the area of solvent replacement (e.g. aqueous cleaners containing hexavalent chrome, ozone depleting chemicals (CFC s and HCFC's), suspect carcinogens). The team evaluates new surface cleanliness inspection and cleaning technologies (e.g. plasma cleaning), and maintains databases for processing support materials as well as outgassing and optical compatibility test results for spaceflight environments.

Effectiveness of HVAC duct cleaning procedures in improving indoor air quality.

PubMed

Ahmad, I; Tansel, B; Mitrani, J D

2001-12-01

Indoor air quality has become one of the most serious environmental concerns as an average person spends about 22 hr indoors on a daily basis. The study reported in this article, was conducted to determine the effectiveness of three commercial HVAC (Heating Ventilation Air Conditioning) duct cleaning processes in reducing the level of airborne particulate matter and viable bioaerosols. The three HVAC sanitation processes were: (1) Contact method (use of conventional vacuum cleaning of interior duct surfaces); (2) Air sweep method (use of compressed air to dislodging dirt and debris); (3) Rotary brush method (insertion of a rotary brush into the ductwork to agitate and dislodge the debris). Effectiveness of these sanitation processes was evaluated in terms of airborne particulate and viable bioaerosol concentrations in residential homes. Eight identical homes were selected in the same neighborhood. Two homes were cleaned using each procedure and two were used as controls. It was found that both particle count readings and bioaerosol concentrations were higher when cleaning was being performed than before or after cleaning, which suggests that dirt, debris and other pollutants may become airborne as a result of disturbances caused by the cleaning processes. Particle count readings at 0.3 micron size were found to have increased due to cigarette smoking. Particle counts at 1.0 micron size were reduced due to HVAC duct cleaning. Post-level bioaerosol concentrations, taken two days after cleaning, were found to be lower than the pre-level concentrations suggesting that the cleaning procedures were effective to some extent. Homes cleaned with the Air Sweep procedure showed the highest degree of reduction in bioaerosol concentration among the three procedures investigated.

Fluorescent Penetrant INSPECTION—CLEANING Study Update

NASA Astrophysics Data System (ADS)

Eisenmann, D.; Brasche, L.

2009-03-01

Fluorescent penetrant inspection (FPI) is widely used in the aviation industry and other industries for surface-breaking crack detection. As with all inspection methods, adherence to the process parameters is critical to the successful detection of defects. There is variety of lubricants and surface coatings used in the aviation industry which must be removed prior to FPI. Before the FPI process begins, components are cleaned using a variety of cleaning methods which are selected based on the alloy and the soil types which must be removed. It is also important that the cleaning process not adversely affect the FPI process. From the first three phases of this project it has been found that a hot water rinse can aid in the detection process when using this nondestructive method.

Replacement Technologies for Precision Cleaning of Aerospace Hardware for Propellant Service

NASA Technical Reports Server (NTRS)

Beeson, Harold; Kirsch, Mike; Hornung, Steven; Biesinger, Paul

1997-01-01

The NASA White Sands Test Facility (WSTF) is developing cleaning and verification processes to replace currently used chlorofluorocarbon-l13- (CFC-113-) based processes. The processes being evaluated include both aqueous- and solvent-based techniques. Replacement technologies are being investigated for aerospace hardware and for gauges and instrumentation. This paper includes the findings of investigations of aqueous cleaning and verification of aerospace hardware using known contaminants, such as hydraulic fluid and commonly used oils. The results correlate nonvolatile residue with CFC 113. The studies also include enhancements to aqueous sampling for organic and particulate contamination. Although aqueous alternatives have been identified for several processes, a need still exists for nonaqueous solvent cleaning, such as the cleaning and cleanliness verification of gauges used for oxygen service. The cleaning effectiveness of tetrachloroethylene (PCE), trichloroethylene (TCE), ethanol, hydrochlorofluorocarbon 225 (HCFC 225), HCFC 141b, HFE 7100(R), and Vertrel MCA(R) was evaluated using aerospace gauges and precision instruments and then compared to the cleaning effectiveness of CFC 113. Solvents considered for use in oxygen systems were also tested for oxygen compatibility using high-pressure oxygen autogenous ignition and liquid oxygen mechanical impact testing.

Development of a Replacement for Trichloroethylene in the Two-Stage Cleaning Process

DTIC Science & Technology

1992-12-01

Auger-Determined Carbon/Iron Ratios of Set 4 ..................... 15 3 Abstract Isopropyl alcohol, d- limonene , and a synthetic mineral spirits were...found to be as clean as those alcohol, d- limonene , and a synthetic cleaned by the standard two-stage mineral spirits,- were chosen to be process...selected, therefore, was to soil test specimens with Another candidate was d- limonene . It has representative soils, clean them by the been extensively

Fogging technique used to coat magnesium with plastic

NASA Technical Reports Server (NTRS)

Mroz, T. S.

1967-01-01

Cleaning process and a fogging technique facilitate the application of a plastic coating to magnesium plates. The cleaning process removes general organic and inorganic surface impurities, oils and greases, and oxides and carbonates from the magnesium surfaces. The fogging technique produces a thin-filmlike coating in a clean room atmosphere.

ENHANCED CHEMICAL CLEANING: A NEW PROCESS FOR CHEMICALLY CLEANING SAVANNAH RIVER WASTE TANKS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Ketusky, E; Neil Davis, N; Renee Spires, R

2008-01-17

The Savannah River Site (SRS) has 49 high level waste (HLW) tanks that must be emptied, cleaned, and closed as required by the Federal Facilities Agreement. The current method of chemical cleaning uses several hundred thousand gallons per tank of 8 weight percent (wt%) oxalic acid to partially dissolve and suspend residual waste and corrosion products such that the waste can be pumped out of the tank. This adds a significant quantity of sodium oxalate to the tanks and, if multiple tanks are cleaned, renders the waste incompatible with the downstream processing. Tank space is also insufficient to store thismore » stream given the large number of tanks to be cleaned. Therefore, a search for a new cleaning process was initiated utilizing the TRIZ literature search approach, and Chemical Oxidation Reduction Decontamination--Ultraviolet (CORD-UV), a mature technology currently used for decontamination and cleaning of commercial nuclear reactor primary cooling water loops, was identified. CORD-UV utilizes oxalic acid for sludge dissolution, but then decomposes the oxalic acid to carbon dioxide and water by UV treatment outside the system being treated. This allows reprecipitation and subsequent deposition of the sludge into a selected container without adding significant volume to that container, and without adding any new chemicals that would impact downstream treatment processes. Bench top and demonstration loop measurements on SRS tank sludge stimulant demonstrated the feasibility of applying CORD-UV for enhanced chemical cleaning of SRS HLW tanks.« less

Surface cleaning for negative electron affinity GaN photocathode

NASA Astrophysics Data System (ADS)

Qiao, Jianliang; Yin, Yingpeng; Gao, Youtang; Niu, Jun; Qian, Yunsheng; Chang, Benkang

2012-10-01

In the preparation process for negative electron affinity (NEA) GaN photocathode, the surface cleanness is very important to activation, it influences the sensitivity and stability of NEA GaN photocathode. The traditional corrosion methods based on oxidizing and dissolving can't remove oxygen (O) and carbon (C) on GaN surface effectively. How to get an ideal atom clean surface is still an important question at present. The cleaning techniques for GaN photocathode was studied by using NEA photocathode activation system and XPS surface analysis system. The experiment sample is p-type GaN doped with Mg, doped concentration is 1.37×1017 cm-3, the transfer rate is 3.08 cm2/V-S, and the thickness of activation layer is 0.51 μm, the substrate is 300 μm thick sapphire. The sample was dealed with chemical cleaning depuration at first. And to get the atom clean surface, the vacuum heat cleaning process was needed. The methods of chemical cleaning and the vacuum heating cleaning were given in detail. According to the X-ray photoelectron spectroscopy of GaN surface after chemical cleaning and the vacuum degree curve of the activation chamber during the heat cleaning, the cleaning effect and the cleaning mechanism were discussed. After the effective chemical cleaning and the heating of 700 Centigrade degree about 20 minutes in ultrahigh vacuum system, the oxides and carbon contaminants on cathode surface can be removed effectively, and the ideal atom clean surface can be obtained. The purpose of heating depuration process is that not only to get the atom clean GaN surface, but also to guarantee the contents of Ga, N on GaN surface stabilize and to keep the system ultra-high vacuum degree. Because of the volatilization of oxide and carbon impurity on the cathode surface, the vacuum degree curve drops with the rising of temperature on the whole.

Gas-Liquid Supersonic Cleaning and Cleaning Verification Spray System

NASA Technical Reports Server (NTRS)

Parrish, Lewis M.

2009-01-01

NASA Kennedy Space Center (KSC) recently entered into a nonexclusive license agreement with Applied Cryogenic Solutions (ACS), Inc. (Galveston, TX) to commercialize its Gas-Liquid Supersonic Cleaning and Cleaning Verification Spray System technology. This technology, developed by KSC, is a critical component of processes being developed and commercialized by ACS to replace current mechanical and chemical cleaning and descaling methods used by numerous industries. Pilot trials on heat exchanger tubing components have shown that the ACS technology provides for: Superior cleaning in a much shorter period of time. Lower energy and labor requirements for cleaning and de-scaling uper.ninih. Significant reductions in waste volumes by not using water, acidic or basic solutions, organic solvents, or nonvolatile solid abrasives as components in the cleaning process. Improved energy efficiency in post-cleaning heat exchanger operations. The ACS process consists of a spray head containing supersonic converging/diverging nozzles, a source of liquid gas; a novel, proprietary pumping system that permits pumping liquid nitrogen, liquid air, or supercritical carbon dioxide to pressures in the range of 20,000 to 60,000 psi; and various hoses, fittings, valves, and gauges. The size and number of nozzles can be varied so the system can be built in configurations ranging from small hand-held spray heads to large multinozzle cleaners. The system also can be used to verify if a part has been adequately cleaned.

Fouling of a spiral-wound reverse osmosis membrane processing swine wastewater: effect of cleaning procedure on fouling resistance.

PubMed

Camilleri-Rumbau, M S; Masse, L; Dubreuil, J; Mondor, M; Christensen, K V; Norddahl, B

2016-01-01

Swine manure is a valuable source of nitrogen, phosphorus and potassium. After solid-liquid separation, the resulting swine wastewater can be concentrated by reverse osmosis (RO) to produce a nitrogen-potassium rich fertilizer. However, swine wastewater has a high fouling potential and an efficient cleaning strategy is required. In this study, a semi-commercial farm scale RO spiral-wound membrane unit was fouled while processing larger volumes of swine wastewater during realistic cyclic operations over a 9-week period. Membrane cleaning was performed daily. Three different cleaning solutions, containing SDS, SDS+EDTA and NaOH were compared. About 99% of the fouling resistance could be removed by rinsing the membrane with water. Flux recoveries (FRs) above 98% were achieved for all the three cleaning solutions after cleaning. No significant differences in FR were found between the cleaning solutions. The NaOH solution thus is a good economical option for cleaning RO spiral-wound membranes fouled with swine wastewater. Soaking the membrane for 3 days in permeate water at the end of each week further improved the FR. Furthermore, a fouling resistance model for predicting the fouling rate, permeate flux decay and cleaning cycle periods based on processing time and swine wastewater conductivity was developed.

Assessment of the potential suitability of selected commercially available enzymes for cleaning-in-place (CIP) in the dairy industry.

PubMed

Boyce, Angela; Piterina, Anna V; Walsh, Gary

2010-10-01

The potential suitability of 10 commercial protease and lipase products for cleaning-in-place (CIP) application in the dairy industry was investigated on a laboratory scale. Assessment was based primarily on the ability of the enzymes to remove an experimentally generated milk fouling deposit from stainless steel (SS) panels. Three protease products were identified as being most suitable for this application on the basis of their cleaning performance at 40 °C, which was comparable to that of the commonly used cleaning agent, 1% NaOH at 60 °C. This was judged by quantification of residual organic matter and protein on the SS surface after cleaning and analysis by laser scanning confocal microscopy (LSCM). Enzyme activity was removed/inactivated under conditions simulating those normally undertaken after cleaning (rinsing with water, acid circulation, sanitation). Preliminary process-scale studies strongly suggest that enzyme-based CIP achieves satisfactory cleaning at an industrial scale. Cost analysis indicates that replacing caustic-based cleaning procedures with biodegradable enzymes operating at lower temperatures would be economically viable. Additional potential benefits include decreased energy and water consumption, improved safety, reduced waste generation, greater compatibility with wastewater treatment processes and a reduction in the environmental impact of the cleaning process.

Contamination control and assay results for the Majorana Demonstrator ultra clean components

NASA Astrophysics Data System (ADS)

Christofferson, C. D.; Abgrall, N.; Alvis, S. I.; Arnquist, I. J.; Avignone, F. T.; Barabash, A. S.; Barton, C. J.; Bertrand, F. E.; Bode, T.; Bradley, A. W.; Brudanin, V.; Busch, M.; Buuck, M.; Caldwell, T. S.; Chan, Y.-D.; Chu, P.-H.; Cuesta, C.; Detwiler, J. A.; Dunagan, C.; Efremenko, Yu.; Ejiri, H.; Elliott, S. R.; Gilliss, T.; Giovanetti, G. K.; Green, M. P.; Gruszko, J.; Guinn, I. S.; Guiseppe, V. E.; Haufe, C. R.; Hehn, L.; Henning, R.; Hoppe, E. W.; Howe, M. A.; Keeter, K. J.; Kidd, M. F.; Konovalov, S. I.; Kouzes, R. T.; Lopez, A. M.; Martin, R. D.; Massarczyk, R.; Meijer, S. J.; Mertens, S.; Myslik, J.; O'Shaughnessy, C.; Othman, G.; Poon, A. W. P.; Radford, D. C.; Rager, J.; Reine, A. L.; Rielage, K.; Robertson, R. G. H.; Rouf, N. W.; Shanks, B.; Shirchenko, M.; Suriano, A. M.; Tedeschi, D.; Trimble, J. E.; Varner, R. L.; Vasilyev, S.; Vetter, K.; Vorren, K.; White, B. R.; Wilkerson, J. F.; Wiseman, C.; Xu, W.; Yakushev, E.; Yu, C.-H.; Yumatov, V.; Zhitnikov, I.; Zhu, B. X.

2018-01-01

The Majorana Demonstrator is a neutrinoless double beta decay experiment utilizing enriched Ge-76 detectors in 2 separate modules inside of a common solid shield at the Sanford Underground Research Facility. The Demonstrator has utilized world leading assay sensitivities to develop clean materials and processes for producing ultra-pure copper and plastic components. This experiment is now operating, and initial data provide new insights into the success of cleaning and processing. Post production copper assays after the completion of Module 1 showed an increase in U and Th contamination in finished parts compared to starting bulk material. A revised cleaning method and additional round of surface contamination studies prior to Module 2 construction have provided evidence that more rigorous process control can reduce surface contamination. This article describes the assay results and discuss further studies to take advantage of assay capabilities for the purpose of maintaining ultra clean fabrication and process design.

[Cleaning and disinfection of surfaces in hospitals: Data on structure, process and result in the Frankfurt/Main Metropolitan Area].

PubMed

Hausemann, A; Hofmann, H; Otto, U; Heudorf, Ursel

2015-06-01

In addition to hand hygiene and reprocessing of medical products, cleaning and disinfection of surfaces is also an important issue in the prevention of germ transmission and by implication infections. Therefore, in 2014, the quality of the structure, process and result of surface preparation of all hospitals in Frankfurt am Main, Germany, was monitored. All 17 hospitals transferred information on the quality of structure. Process quality was obtained through direct observation during cleaning and disinfection of rooms and their plumbing units. Result quality was gained using the fluorescent method, i.e. marking surfaces with a fluorescent liquid and testing if this mark has been sufficiently removed by cleaning. Structure quality: in all hospitals the employees were trained regularly. In 12 of them, the foremen had the required qualifications, in 6 hospitals unclarity as to the intersection of the cleaning and care services remained. In 14 hospitals only visible contamination was cleaned on the weekends, whereas complete cleaning was reported to take place in 12 hospitals on Saturdays and in 2 hospitals on Sundays. The contractually stipulated cleaning (observations specified in brackets) averaged 178 m(2)/h (148 m(2)/h) per patient room and 69 m(2)/h (33 m(2)/h) for bathrooms. Process quality: during process monitoring, various hand contact surfaces were prepared insufficiently. Result quality: 63 % of fluorescent markings were appropriately removed. The need for improvement is given especially in the area of the qualification of the foremen and a in a clear definition of the intersection between cleaning and care services, as well as in the regulations for weekends and public holidays.

Porcelain-coated antenna for radio-frequency driven plasma source

DOEpatents

Leung, K.N.; Wells, R.P.; Craven, G.E.

1996-12-24

A new porcelain-enamel coated antenna creates a clean plasma for volume or surface-conversion ion sources. The porcelain-enamel coating is hard, electrically insulating, long lasting, non fragile, and resistant to puncture by high energy ions in the plasma. Plasma and ion production using the porcelain enamel coated antenna is uncontaminated with filament or extraneous metal ions because the porcelain does not evaporate and is not sputtered into the plasma during operation. Ion beams produced using the new porcelain-enamel coated antenna are useful in ion implantation, high energy accelerators, negative, positive, or neutral beam applications, fusion, and treatment of chemical or radioactive waste for disposal. For ion implantation, the appropriate species ion beam generated with the inventive antenna will penetrate large or small, irregularly shaped conducting objects with a narrow implantation profile. 8 figs.

Washing away your sins in the brain: physical cleaning and priming of cleaning recruit different brain networks after moral threat

PubMed Central

Tang, Honghong; Lu, Xiaping; Su, Rui; Liang, Zilu; Mai, Xiaoqin

2017-01-01

Abstract The association between moral purity and physical cleanliness has been widely discussed recently. Studies found that moral threat initiates the need of physical cleanliness, but actual physical cleaning and priming of cleaning have inconsistent effects on subsequent attitudes and behaviors. Here, we used resting-state functional magnetic resonance imaging to explore the underlying neural mechanism of actual physical cleaning and priming of cleaning. After recalling moral transgression with strong feelings of guilt and shame, participants either actually cleaned their faces with a wipe or were primed with cleanliness through viewing its pictures. Results showed that actual physical cleaning reduced the spontaneous brain activities in the right insula and MPFC, regions that involved in embodied moral emotion processing, while priming of cleaning decreased activities in the right superior frontal gyrus and middle frontal gyrus, regions that participated in executive control processing. Additionally, actual physical cleaning also changed functional connectivity between insula/MPFC and emotion related regions, whereas priming of cleaning modified connectivity within both moral and sensorimotor areas. These findings revealed that actual physical cleaning and priming of cleaning led to changes in different brain regions and networks, providing neural evidence for the inconsistent effects of cleanliness on subsequent attitudes and behaviors. PMID:28338887

Washing away your sins in the brain: physical cleaning and priming of cleaning recruit different brain networks after moral threat.

PubMed

Tang, Honghong; Lu, Xiaping; Su, Rui; Liang, Zilu; Mai, Xiaoqin; Liu, Chao

2017-07-01

The association between moral purity and physical cleanliness has been widely discussed recently. Studies found that moral threat initiates the need of physical cleanliness, but actual physical cleaning and priming of cleaning have inconsistent effects on subsequent attitudes and behaviors. Here, we used resting-state functional magnetic resonance imaging to explore the underlying neural mechanism of actual physical cleaning and priming of cleaning. After recalling moral transgression with strong feelings of guilt and shame, participants either actually cleaned their faces with a wipe or were primed with cleanliness through viewing its pictures. Results showed that actual physical cleaning reduced the spontaneous brain activities in the right insula and MPFC, regions that involved in embodied moral emotion processing, while priming of cleaning decreased activities in the right superior frontal gyrus and middle frontal gyrus, regions that participated in executive control processing. Additionally, actual physical cleaning also changed functional connectivity between insula/MPFC and emotion related regions, whereas priming of cleaning modified connectivity within both moral and sensorimotor areas. These findings revealed that actual physical cleaning and priming of cleaning led to changes in different brain regions and networks, providing neural evidence for the inconsistent effects of cleanliness on subsequent attitudes and behaviors. © The Author (2017). Published by Oxford University Press.

Application of atmospheric pressure plasma in polymer and composite adhesion

NASA Astrophysics Data System (ADS)

Yu, Hang

An atmospheric pressure helium and oxygen plasma was used to investigate surface activation and bonding in polymer composites. This device was operated by passing 1.0-3.0 vol% of oxygen in helium through a pair of parallel plate metal electrodes powered by 13.56 or 27.12 MHz radio frequency power. The gases were partially ionized between the capacitors where plasma was generated. The reactive species in the plasma were carried downstream by the gas flow to treat the substrate surface. The temperature of the plasm gas reaching the surface of the substrate did not exceed 150 °C, which makes it suitable for polymer processing. The reactive species in the plasma downstream includes ~ 1016-1017 cm-3 atomic oxygen, ~ 1015 cm-3 ozone molecule, and ~ 10 16 cm-3 metastable oxygen molecule (O2 1Deltag). The substrates were treated at 2-5 mm distance from the exit of the plasma. Surface properties of the substrates were characterized using water contact angle (WCA), atomic force microscopy (AFM), infrared spectroscopy (IR), and X-ray photoelectron spectroscopy (XPS). Subsequently, the plasma treated samples were bonded adhesively or fabricated into composites. The increase in mechanical strength was correlated to changes in the material composition and structure after plasma treatment. The work presented hereafter establishes atmospheric pressure plasma as an effective method to activate and to clean the surfaces of polymers and composites for bonding. This application can be further expanded to the activation of carbon fibers for better fiber-resin interactions during the fabrication of composites. Treating electronic grade FR-4 and polyimide with the He/O2 plasma for a few seconds changed the substrate surface from hydrophobic to hydrophilic, which allowed complete wetting of the surface by epoxy in underfill applications. Characterization of the surface by X-ray photoelectron spectroscopy shows formation of oxygenated functional groups, including hydroxyl, carbonyl, and carboxyl groups, on the polymer surface after plasma treatment. The resulting strength of the bond based on lap-shear and T-peel tests correlates well with the concentration of oxygen on the polymer surface. The failure modes observed for lap-shear and T-peel tests changed from interfacial to cohesive after the plasma activation. Treating carbon-fiber-reinforced epoxy composites with the atmospheric plasma resulted in the removal of fluorinated contaminants in shallow surface layers. For contaminants that diffused deeply into the composite surface, mechanical abrasion was needed in addition to the plasma treatment to remove the impurities. While cleaning the composite, plasma also generated active oxygen groups on the substrate surface. The presence of these groups improved the adhesive bonding strength of the composite even in the presence of residual fluorine contaminants. Thus, it was speculated that plasma treatment can promote better polymer adhesion with or without fluorine contamination. Carbon nanotube sheets were also treated by the helium oxygen plasma, and the CNT surface turn from super hydrophobic to hydrophilic after a few seconds of exposure. The nanotube surface contained 15% of oxygen in the form of hydroxyl groups. Chemical coupling agents were added to the plasma activated CNT surfaces in order to crosslink the CNTs and to create bonding sites for the resin matrix. Stretched, activated and functionalized CNT was cured with dicyclopentadiene (DCPD) to produce a sheet composite with a tensile strength of 636 MPa, a modulus of 28 GPa, and a density of 1.4 g/cm 3. This may be compared to aerospace-grade aluminum with tensile strength of 572 MPa, modulus of 72 GPa, and density of 2.7 g/cm3. This work demonstrates that new high-strength composite can be produced with the use of atmospheric plasma activation and chemical crosslinking of the fiber matrix.

77 FR 14830 - Notice of Lodging of Consent Decree Under the Clean Air Act

Federal Register 2010, 2011, 2012, 2013, 2014

2012-03-13

... DEPARTMENT OF JUSTICE Notice of Lodging of Consent Decree Under the Clean Air Act Notice is hereby... Clean Air Act, 42 U.S.C. 7413(b). Defendant processes aluminum scrap and dross to produce various secondary aluminum products, a process that results in emissions of regulated air pollutants, including...

Removal of NO and SO2 in Corona Discharge Plasma Reactor with Water Film

NASA Astrophysics Data System (ADS)

He, Yuanji; Dong, Liming; Yang, Jiaxiang

2004-04-01

In this paper, a novel type of a corona discharge plasma reactor was designed, which consists of needle-plate-combined electrodes, in which a series of needle electrodes are placed in a glass container filled with flue gas, and a plate electrode is immersed in the water. Based on this model, the removal of NO and SO2 was tested experimentally. In addition, the effect of streamer polarity on the reduction of SO2 and NO was investigated in detail. The experimental results show that the corona wind formed between the high-voltage needle electrode and the water by corona discharge enhances the cleaning efficiency of the flue gas because of the presence of water, and the cleaning efficiency will increase with the increase of applied dc voltage within a definite range. The removal efficiency of SO2 up to 98%, and about 85% of NOx removal under suitable conditions is obtained in our experiments.

Automated carbon dioxide cleaning system

NASA Technical Reports Server (NTRS)

Hoppe, David T.

1991-01-01

Solidified CO2 pellets are an effective blast media for the cleaning of a variety of materials. CO2 is obtained from the waste gas streams generated from other manufacturing processes and therefore does not contribute to the greenhouse effect, depletion of the ozone layer, or the environmental burden of hazardous waste disposal. The system is capable of removing as much as 90 percent of the contamination from a surface in one pass or to a high cleanliness level after multiple passes. Although the system is packaged and designed for manual hand held cleaning processes, the nozzle can easily be attached to the end effector of a robot for automated cleaning of predefined and known geometries. Specific tailoring of cleaning parameters are required to optimize the process for each individual geometry. Using optimum cleaning parameters the CO2 systems were shown to be capable of cleaning to molecular levels below 0.7 mg/sq ft. The systems were effective for removing a variety of contaminants such as lubricating oils, cutting oils, grease, alcohol residue, biological films, and silicone. The system was effective on steel, aluminum, and carbon phenolic substrates.

[Study on assistant cleaning of ultrasound for the ultrafiltration membrane].

PubMed

Zhang, Guojun; Liu, Zhongzhou

2003-11-01

The effects of ultrasounds with different frequency on membrane performance were investigated in this paper. The experimental results show that there were nearly no effects of 20 W ultrasound on membrane retention coefficient, but it decreased seriously when the ultrasound power was above 30 W. On the basis of these results, low frequency ultrasound (20 W) was introduced to assist the chemical cleaning in the ultrafiltration process of wastewater from bank note printing works. The cleaning time could be shortened from 20-30 min to 5 min by the ultra-liberation and ultra-blend effects of ultrasound, therefore, the cleaning efficiency was highly improved. However, the fouling substances could not be cleaned entirely in the simple physical cleaning process by SEM analysis.

Plasma-treated Langmuir-Blodgett reduced graphene oxide thin film for applications in biophotovoltaics

NASA Astrophysics Data System (ADS)

Ibrahim, Siti Aisyah; Jaafar, Muhammad Musoddiq; Ng, Fong-Lee; Phang, Siew-Moi; Kumar, G. Ghana; Majid, Wan Haliza Abd; Periasamy, Vengadesh

2018-01-01

The surface optimization and structural characteristics of Langmuir-Blodgett (LB) reduced graphene oxide thin (rGO) film treated by argon plasma treatment were studied. In this work, six times deposition of rGO was deposited on a clean glass substrate using the LB method. Plasma technique involving a variation of plasma power, i.e., 20, 60, 100 and 140 W was exposed to the LB-rGO thin films under argon ambience. The plasma treatment generally improves the wettability or hydrophilicity of the film surface compared to without treatment. Maximum wettability was observed at a plasma power of 20 W, while also increasing the adhesion of the rGO film with the glass substrate. The multilayer films fabricated were characterized by means of spectroscopic, structural and electrical studies. The treatment of rGO with argon plasma was found to have improved its biocompatibility, and thus its performance as an electrode for biophotovoltaic devices has been shown to be enhanced considerably.

The Catalytic Effect of Electronegative Additives on Removal of Perchloroethylene Vapor from Air by Pulsed Corona Discharge

NASA Astrophysics Data System (ADS)

Filatov, I. E.; Uvarin, V. V.; Kuznetsov, D. L.

2017-12-01

It is established that electronegative additives (CCl4, freon-113) produce a catalytic effect on the conversion of volatile organic compounds (VOCs) under the action of atmospheric-pressure nonequilibrium plasma generated in pulsed corona discharge. At concentrations below 0.1%, these additives significantly decrease the discharge current, but the energy efficiency of the process of VOC removal from air increases. The catalytic effect of electronegative additives on the VOC conversion in air and nitrogen is quantitatively demonstrated in the case of perchloroethylene C2Cl4 (PCE) vapor removal. The addition of 0.085% CCl4 to air reduces the energy consumption for PCE removal at initial concentration of 0.09% by half (from 12 to 6 eV per molecule) at a 63% degree of cleaning. Mechanisms explaining the active inf luence of electronegative additives on the discharge current and the process of impurity removal are suggested.

/ital In/ /ital situ/ dc oxygen-discharge cleaning system for optical elements

DOE Office of Scientific and Technical Information (OSTI.GOV)

Koide, T.; Shidara, T.; Tanaka, K.

1989-07-01

/ital In/ /ital situ/ dc oxygen-discharge cleaning arrangements have been developed at the Photon Factory for the removal of carbon contamination from optical surfaces. A high cleaning rate could be achieved by producing an oxygen plasma close to the optical elements with special care taken to avoid any harmful effects from the discharge; contaminant carbon was completely removed within a few hours, at most. This short exposure time and the use of dry oxygen gas resulted in a restoration of the original ultrahigh vacuum without a bakeout. Results with a Seya-Namioka beamline for gas-phase experiments showed a flux enhancement amountingmore » to a factor of 50, and results with a grasshopper beamline showed a nearly complete recovery of the light intensity, even at the carbon /ital K/ edge.« less

Impurities, temperature, and density in a miniature electrostatic plasma and current source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Den Hartog, D.J.; Craig, D.J.; Fiksel, G.

1996-10-01

We have spectroscopically investigated the Sterling Scientific miniature electrostatic plasma source-a plasma gun. This gun is a clean source of high density (10{sup 19} - 10{sup 20} m{sup -3}), low temperature (5 - 15 eV) plasma. A key result of our investigation is that molybdenum from the gun electrodes is largely trapped in the internal gun discharge; only a small amount escapes in the plasma flowing out of the gun. In addition, the gun plasma parameters actually improve (even lower impurity contamination and higher ion temperature) when up to 1 kA of electron current is extracted from the gun viamore » the application of an external bias. This improvement occurs because the internal gun anode no longer acts as the current return for the internal gun discharge. The gun plasma is a virtual plasma electrode capable of sourcing an electron emission current density of 1 kA/cm{sup 2}. The high emission current, small size (3 - 4 cm diameter), and low impurity generation make this gun attractive for a variety of fusion and plasma technology applications.« less

Treatment of Candida albicans biofilms with low-temperature plasma induced by dielectric barrier discharge and atmospheric pressure plasma jet

NASA Astrophysics Data System (ADS)

Koban, Ina; Matthes, Rutger; Hübner, Nils-Olaf; Welk, Alexander; Meisel, Peter; Holtfreter, Birte; Sietmann, Rabea; Kindel, Eckhard; Weltmann, Klaus-Dieter; Kramer, Axel; Kocher, Thomas

2010-07-01

Because of some disadvantages of chemical disinfection in dental practice (especially denture cleaning), we investigated the effects of physical methods on Candida albicans biofilms. For this purpose, the antifungal efficacy of three different low-temperature plasma devices (an atmospheric pressure plasma jet and two different dielectric barrier discharges (DBDs)) on Candida albicans biofilms grown on titanium discs in vitro was investigated. As positive treatment controls, we used 0.1% chlorhexidine digluconate (CHX) and 0.6% sodium hypochlorite (NaOCl). The corresponding gas streams without plasma ignition served as negative treatment controls. The efficacy of the plasma treatment was determined evaluating the number of colony-forming units (CFU) recovered from titanium discs. The plasma treatment reduced the CFU significantly compared to chemical disinfectants. While 10 min CHX or NaOCl exposure led to a CFU log10 reduction factor of 1.5, the log10 reduction factor of DBD plasma was up to 5. In conclusion, the use of low-temperature plasma is a promising physical alternative to chemical antiseptics for dental practice.

Fluidized-Bed Cleaning of Silicon Particles

NASA Technical Reports Server (NTRS)

Rohatgi, Naresh K.; Hsu, George C.

1987-01-01

Fluidized-bed chemical cleaning process developed to remove metallic impurities from small silicon particles. Particles (250 micrometer in size) utilized as seed material in silane pyrolysis process for production of 1-mm-size silicon. Product silicon (1 mm in size) used as raw material for fabrication of solar cells and other semiconductor devices. Principal cleaning step is wash in mixture of hydrochloric and nitric acids, leaching out metals and carrying them away as soluble chlorides. Particles fluidized by cleaning solution to assure good mixing and uniform wetting.

Materials Science Clean Room Facility at Tulane University (Final Technical Report)

DOE Office of Scientific and Technical Information (OSTI.GOV)

Altiero, Nicholas

2010-09-30

The project involves conversion of a 3,000 sq. ft. area into a clean room facility for materials science research. It will be accomplished in phases. Phase I will involve preparation of the existing space, acquisition and installation of clean room equipped with a pulsed laser deposition (PLD) processing system, and conversion of ancillary space to facilitate the interface with the clean room. From a capital perspective, Phases II and III will involve the acquisition of additional processing, fabrication, and characterization equipment and capabilities.

Investigation of Coatings for Langmuir Probes in an Oxygen-Rich Space Environment

NASA Astrophysics Data System (ADS)

Samaniego, J. I.; Wang, X.; Andersson, L.; Malaspina, D.; Ergun, R.; Horanyi, M.

2017-12-01

The surface properties of the Langmuir probes, such as the one on the MAVEN mission, will change after exposure to upper planetary atmospheres where high concentrations of atomic oxygen and other oxidizing compounds are present. TiN (Titanium Nitride) or DAG (a resin based graphite dispersion) are the most common coatings for current Langmuir probes, yet both of these coatings pose issues when exposed to oxygen-rich space environment. TiN showed reduced surface conductivity while the DAG layers erode with exposure to oxygen. It is known that Iridium (Ir) and Rhenium (Rh) are difficult to oxidize and maintain high conductivity even in their oxidized forms, suggesting them to be good candidates for probe coatings. Oxidation of most metals creates a resistive layer on the surface of the probe that will affect the amount of current being collected at a given voltage during the probe sweep and therefore affect the accuracy of plasma parameters determined by the Langmuir probe (e.g. density, temperature). We present the results of the oxidation effect on the current-voltage curves (I-V curves) and therefore the resulting measured plasma parameters of Ir and Rh wire probes compared with other control metals and coatings (Cu, Ni, TiN) in controlled plasma environments. The oxidation process is performed in an oxygen plasma chamber in which both O+ and O2+ are created and accelerated toward the probes with energies < 10 eV. An argon plasma chamber is used to compare the probe's I-V curves before and after the oxidation process. Our preliminary results indicate that iridium shows the least effect of oxidation on the probe measurements. The second objective of this study is to identify methods that can be used in orbit to clean the surface of Langmuir probes to minimize the effect of exposure to oxidizing compounds.

[Study on the Emission Spectrum of Hydrogen Production with Microwave Discharge Plasma in Ethanol Solution].

PubMed

Sun, Bing; Wang, Bo; Zhu, Xiao-mei; Yan, Zhi-yu; Liu, Yong-jun; Liu, Hui

2016-03-01

Hydrogen is regarded as a kind of clean energy with high caloricity and non-pollution, which has been studied by many experts and scholars home and abroad. Microwave discharge plasma shows light future in the area of hydrogen production from ethanol solution, providing a new way to produce hydrogen. In order to further improve the technology and analyze the mechanism of hydrogen production with microwave discharge in liquid, emission spectrum of hydrogen production by microwave discharge plasma in ethanol solution was being studied. In this paper, plasma was generated on the top of electrode by 2.45 GHz microwave, and the spectral characteristics of hydrogen production from ethanol by microwave discharge in liquid were being studied using emission spectrometer. The results showed that a large number of H, O, OH, CH, C2 and other active particles could be produced in the process of hydrogen production from ethanol by microwave discharge in liquid. The emission spectrum intensity of OH, H, O radicals generated from ethanol is far more than that generated from pure water. Bond of O-H split by more high-energy particles from water molecule was more difficult than that from ethanol molecule, so in the process of hydrogen production by microwave discharge plasma in ethanol solution; the main source of hydrogen was the dehydrogenation and restructuring of ethanol molecules instead of water decomposition. Under the definite external pressure and temperature, the emission spectrum intensity of OH, H, O radicals increased with the increase of microwave power markedly, but the emission spectrum intensity of CH, C2 active particles had the tendency to decrease with the increase of microwave power. It indicated that the number of high energy electrons and active particles high energy electron energy increased as the increase of microwave power, so more CH, C2 active particles were split more thoroughly.

An improved method for polarimetric image restoration in interferometry

NASA Astrophysics Data System (ADS)

Pratley, Luke; Johnston-Hollitt, Melanie

2016-11-01

Interferometric radio astronomy data require the effects of limited coverage in the Fourier plane to be accounted for via a deconvolution process. For the last 40 years this process, known as `cleaning', has been performed almost exclusively on all Stokes parameters individually as if they were independent scalar images. However, here we demonstrate for the case of the linear polarization P, this approach fails to properly account for the complex vector nature resulting in a process which is dependent on the axes under which the deconvolution is performed. We present here an improved method, `Generalized Complex CLEAN', which properly accounts for the complex vector nature of polarized emission and is invariant under rotations of the deconvolution axes. We use two Australia Telescope Compact Array data sets to test standard and complex CLEAN versions of the Högbom and SDI (Steer-Dwedney-Ito) CLEAN algorithms. We show that in general the complex CLEAN version of each algorithm produces more accurate clean components with fewer spurious detections and lower computation cost due to reduced iterations than the current methods. In particular, we find that the complex SDI CLEAN produces the best results for diffuse polarized sources as compared with standard CLEAN algorithms and other complex CLEAN algorithms. Given the move to wide-field, high-resolution polarimetric imaging with future telescopes such as the Square Kilometre Array, we suggest that Generalized Complex CLEAN should be adopted as the deconvolution method for all future polarimetric surveys and in particular that the complex version of an SDI CLEAN should be used.

The relationship between lead in plasma and whole blood in women.

PubMed Central

Smith, Donald; Hernandez-Avila, Mauricio; Téllez-Rojo, Martha Maria; Mercado, Adriana; Hu, Howard

2002-01-01

Studies have suggested that plasma lead levels may better reflect the toxicologically labile fraction of circulatory Pb that is more freely available for exchange with target tissues than do Pb levels in whole blood. Studies have also reported an apparent severalfold variation in the relative partitioning of Pb between whole blood and plasma (or serum) for a given whole-blood Pb level. This may reflect inherent differences in the plasma Pb/whole blood Pb partitioning among individuals and/or methodologic challenges associated with the collection and analyses of samples that generally contain < 1-2 ng total Pb. Here, we conducted a longitudinal assessment of the relationship between Pb in whole blood and plasma in environmentally exposed reproductive-age women (n = 63) living in Mexico City, Mexico. We collected whole blood and plasma samples using trace metal clean techniques and analyzed them for Pb using high-resolution inductively coupled plasma mass spectrometry. A subset of subjects provided repeated blood samples weekly for 4 consecutive weeks (n = 17 subjects) or every 1-2 months over a 9-month period (n = 14 subjects). Plasma Pb concentration was significantly positively associated with whole-blood Pb in a curvilinear fashion over the range of blood Pb values observed here (2.13-39.7 microg/dL). This relationship was best described by the function Plasma Pb = e (-2.392 + 0.0898 x blood Pb), where SE(coefficient) = 0.0054, SE(constant) = 0.063 (n = 63 subjects, n = 141 observations). Results from the short- and long-term repeated collection subjects indicated that the within- and between-subject variance components were not significantly different between the two subsets of subjects. The between-subjects component accounts for 78% of the variance in plasma Pb levels, while the residual variance (22%) may be attributed to other unmeasured factors. Collectively, this study demonstrates that plasma Pb measurements may be applied to general clinical settings, provided that established trace metal clean techniques are adopted. This study also shows that the relative (%) partitioning of whole-blood Pb in plasma naturally varies by a factor of about 2-4-fold among subjects at a given blood Pb level. Because Pb in the plasma is considered to more closely represent the fraction of Pb in the circulation that is readily exchanged with peripheral target tissues (e.g., brain, kidney, skeleton), the routine assessment of plasma Pb may provide a more meaningful measure of toxicologically available Pb. PMID:11882477

Cheap non-toxic non-corrosive method of glass cleaning evaluated by contact angle, AFM, and SEM-EDX measurements.

PubMed

Dey, Tania; Naughton, Daragh

2017-05-01

Glass surface cleaning is the very first step in advanced coating deposition and it also finds use in conserving museum objects. However, most of the wet chemical methods of glass cleaning use toxic and corrosive chemicals like concentrated sulfuric acid (H 2 SO 4 ), piranha (a mixture of concentrated sulfuric acid and 30% hydrogen peroxide), and hydrogen fluoride (HF). On the other hand, most of the dry cleaning techniques like UV-ozone, plasma, and laser treatment require costly instruments. In this report, five eco-friendly wet chemical methods of glass cleaning were evaluated in terms of contact angle (measured by optical tensiometer), nano-scale surface roughness (measured by atomic force microscopy or AFM), and elemental composition (measured by energy dispersive x-ray spectroscopy or SEM-EDX). These glass cleaning methods are devoid of harsh chemicals and costly equipment, hence can be applied in situ in close proximity with plantation such as greenhouse or upon subtle objects such as museum artifacts. Out of these five methods, three methods are based on the chemical principle of chelation. It was found that the citric acid cleaning method gave the greatest change in contact angle within the hydrophilic regime (14.25° for new glass) indicating effective cleansing and the least surface roughness (0.178 nm for new glass) indicating no corrosive effect. One of the glass sample showed unique features which were traced backed to the history of the glass usage.

Towards sustainable and safe apparel cleaning methods: A review.

PubMed

Troynikov, Olga; Watson, Christopher; Jadhav, Amit; Nawaz, Nazia; Kettlewell, Roy

2016-11-01

Perchloroethylene (PERC) is a compound commonly used as a solvent in dry cleaning, despite its severe health and environmental impacts. In recent times chemicals such as hydrocarbons, GreenEarth(®), acetal and liquid carbon dioxide have emerged as less damaging substitutes for PERC, and an even more sustainable water-based wet cleaning process has been developed. We employed a systematic review approach to provide a comprehensive overview of the existing research evidence in the area of sustainable and safe apparel cleaning methods and care. Our review describes traditional professional dry cleaning methods, as well as those that utilise solvents other than PERC, and their ecological attributes. In addition, the new professional wet cleaning process is discussed. Finally, we address the health hazards of the various solvents used in dry cleaning and state-of-the-art solvent residue trace analysis techniques. Copyright © 2016 Elsevier Ltd. All rights reserved.

Neutral beam dump with cathodic arc titanium gettering

DOE Office of Scientific and Technical Information (OSTI.GOV)

Smirnov, A.; Korepanov, S. A.; Putvinski, S.

An incomplete neutral beam capture can degrade the plasma performance in neutral beam driven plasma machines. The beam dumps mitigating the shine-through beam recycling must entrap and retain large particle loads while maintaining the beam-exposed surfaces clean of the residual impurities. The cathodic arc gettering, which provides high evaporation rate coupled with a fast time response, is a powerful and versatile technique for depositing clean getter films in vacuum. A compact neutral beam dump utilizing the titanium arc gettering was developed for a field-reversed configuration plasma sustained by 1 MW, 20-40 keV neutral hydrogen beams. The titanium evaporator features amore » new improved design. The beam dump is capable of handling large pulsed gas loads, has a high sorption capacity, and is robust and reliable. With the beam particle flux density of 5 x 10{sup 17} H/(cm{sup 2}s) sustained for 3-10 ms, the beam recycling coefficient, defined as twice the ratio of the hydrogen molecular flux leaving the beam dump to the incident flux of high-energy neutral atoms, is {approx}0.7. The use of the beam dump allows us to significantly reduce the recycling of the shine-through neutral beam as well as to improve the vacuum conditions in the machine.« less

Back-diffusion plasma generator for ionosphere study

NASA Astrophysics Data System (ADS)

Fang, H. K.; Oyama, K.-I.; Chen, A. B.

2017-11-01

To produce ionospheric plasma environments at ground level is essential to get information not only for the development of CubeSat-class spacecraft but also for the design of ionospheric plasma instruments and to confirm their performance. In this paper, we describe the principle of plasma generation and characteristics of the back-diffusion plasma source, which can produce in-lab plasma similar to the Earth’s ionosphere, E and F regions, conditions of electron and ion temperature and density. The ion and electron energy distributions of the plasma generated by a back-diffusion source are measured by means of a cleaned Langmuir probe and gridded particle energy analyzers. The ion motion in front of the source is investigated by a hard-sphere collision model in SIMION software and the simulation results are comparable with the findings of our experiment. Furthermore, plasma densities and ion temperatures at different positions in front of the source are also demonstrated. The back-diffusion source has been accommodated for ionospheric plasma productions in several Asian institutes. The plasma characteristics of the source shown in this paper will benefit space research groups in the development of space plasma instruments.

Synthesis and characteristics of Ag/Pt bimetallic nanocomposites by arc-discharge solution plasma processing.

PubMed

Pootawang, Panuphong; Saito, Nagahiro; Takai, Osamu; Lee, Sang-Yul

2012-10-05

Arc discharge in solution, generated by applying a high voltage of unipolar pulsed dc to electrodes of Ag and Pt, was used as a method to form Ag/Pt bimetallic nanocomposites via electrode erosion by the effects of the electric arc at the cathode (Ag rod) and the sputtering at the anode (Pt rod). Ag/Pt bimetallic nanocomposites were formed as colloidal particles dispersed in solution via the reduction of hydrogen radicals generated during discharge without the addition of chemical precursor or reducing agent. At a discharge time of 30 s, the fine bimetallic nanoparticles with a mean particle size of approximately 5 nm were observed by transmission electron microscopy (TEM). With increasing discharge time, the bimetallic nanoparticle size tended to increase by forming an agglomeration. The presence of the relatively small amount of Pt dispersed in the Ag matrix could be observed by the analytical mapping mode of energy-dispersive x-ray spectroscopy and high-resolution TEM. This demonstrated that the synthesized particle was in the form of a nanocomposite. No contamination of other chemical substances was detected by x-ray photoelectron spectroscopy. Hence, solution plasma could be a clean and simple process to effectively synthesize Ag/Pt bimetallic nanocomposites and it is expected to be widely applicable in the preparation of several types of nanoparticle.

Chemical cleaning/disinfection and ageing of organic UF membranes: a review.

PubMed

Regula, C; Carretier, E; Wyart, Y; Gésan-Guiziou, G; Vincent, A; Boudot, D; Moulin, P

2014-06-01

Membrane separation processes have become a basic unit operation for process design and product development. These processes are used in a variety of separation and concentration steps, but in all cases, the membranes must be cleaned regularly to remove both organic and inorganic material deposited on the surface and/or into the membrane bulk. Cleaning/disinfection is a vital step in maintaining the permeability and selectivity of the membrane in order to get the plant to its original capacity, to minimize risks of bacteriological contamination, and to make acceptable products. For this purpose, a large number of chemical cleaning/disinfection agents are commercially available. In general, these cleaning/disinfection agents have to improve the membrane flux to a certain extent. However, they can also cause irreversible damages in membrane properties and performances over the long term. Until now, there is considerably less literature dedicated to membrane ageing than to cleaning/disinfection. The knowledge in cleaning/disinfection efficiency has recently been improved. But in order to develop optimized cleaning/disinfection protocols there still remains a challenge to better understand membrane ageing. In order to compensate for the lack of correlated cleaning/disinfection and ageing data from the literature, this paper investigates cleaning/disinfection efficiencies and ageing damages of organic ultrafiltration membranes. The final aim is to provide less detrimental cleaning/disinfection procedures and to propose some guidelines which should have been taken into consideration in term of membrane ageing studies. To carry out this study, this article will detail the background of cleaning/disinfection and aging membrane topics in a first introductive part. In a second part, key factors and endpoints of cleaning/disinfection and aging membranes will be discussed deeply: the membrane role and the cleaning parameters roles, such as water quality, storing conditions, cleaning/disinfection/aging agents/conditions/protocols. The third and last part will be developed the parameters, methods and ways of characterization at our disposal and commonly used to develop and implement membrane cleaning and/or ageing studies. Copyright © 2014 Elsevier Ltd. All rights reserved.

The Research and Implementation of MUSER CLEAN Algorithm Based on OpenCL

NASA Astrophysics Data System (ADS)

Feng, Y.; Chen, K.; Deng, H.; Wang, F.; Mei, Y.; Wei, S. L.; Dai, W.; Yang, Q. P.; Liu, Y. B.; Wu, J. P.

2017-03-01

It's urgent to carry out high-performance data processing with a single machine in the development of astronomical software. However, due to the different configuration of the machine, traditional programming techniques such as multi-threading, and CUDA (Compute Unified Device Architecture)+GPU (Graphic Processing Unit) have obvious limitations in portability and seamlessness between different operation systems. The OpenCL (Open Computing Language) used in the development of MUSER (MingantU SpEctral Radioheliograph) data processing system is introduced. And the Högbom CLEAN algorithm is re-implemented into parallel CLEAN algorithm by the Python language and PyOpenCL extended package. The experimental results show that the CLEAN algorithm based on OpenCL has approximately equally operating efficiency compared with the former CLEAN algorithm based on CUDA. More important, the data processing in merely CPU (Central Processing Unit) environment of this system can also achieve high performance, which has solved the problem of environmental dependence of CUDA+GPU. Overall, the research improves the adaptability of the system with emphasis on performance of MUSER image clean computing. In the meanwhile, the realization of OpenCL in MUSER proves its availability in scientific data processing. In view of the high-performance computing features of OpenCL in heterogeneous environment, it will probably become the preferred technology in the future high-performance astronomical software development.

Evaluation of pressurized water cleaning systems for hardware refurbishment

NASA Technical Reports Server (NTRS)

Dillard, Terry W.; Deweese, Charles D.; Hoppe, David T.; Vickers, John H.; Swenson, Gary J.; Hutchens, Dale E.

1995-01-01

Historically, refurbishment processes for RSRM motor cases and components have employed environmentally harmful materials. Specifically, vapor degreasing processes consume and emit large amounts of ozone depleting compounds. This program evaluates the use of pressurized water cleaning systems as a replacement for the vapor degreasing process. Tests have been conducted to determine if high pressure water washing, without any form of additive cleaner, is a viable candidate for replacing vapor degreasing processes. This paper discusses the findings thus far of Engineering Test Plan - 1168 (ETP-1168), 'Evaluation of Pressurized Water Cleaning Systems for Hardware Refurbishment.'

NiTi shape memory alloys treated by plasma-polymerized tetrafluoroethylene. A physicochemical and electrochemical characterization.

PubMed

Yahia, L H; Lombardi, S; Piron, D; Klemberg-Sapieha, J E; Wertheimer, M R

NiTi alloy specimens were plasma cleaned and then coated with a thin film of plasma-polymerized tetrafluoroethylene (TFE) in a Radio-Frequency reactor. The corrosion protection provided by these films was studied by potentiodynamic tests performed in Hank's physiological solution. Surface properties which determine biocompatibility were characterized by X-ray photoelectron spectroscopy (XPS). The results showed that the surface of untreated NiTi was mostly composed by oxygen, carbon, titanium oxide (TiO2) with traces of nickel oxides (NiO and Ni2O3) and metallic Ni. The passivity of untreated NiTi was found to be unstable in the simulated human body media. After plasma treatment, the NiTi surface contained only carbon and fluor. The plasma-polymerized thin film was found to stabilize the NiTi passivity and to increase its pitting potential. This treatment provides a good protection against dissolution of nickel from NiTi alloys.

Quality Partners

ERIC Educational Resources Information Center

Clark, Bob

2006-01-01

Green cleaning is gaining momentum. It is a method of cleaning and maintaining facilities that is friendly to the environment and healthful for students and staff. The process uses environmentally friendly and nontoxic cleaning products and practices that must be third-party-certified. Using green cleaning practices and products can result in…

SAGE SOLVENT ALTERNATIVES GUIDE: SYSTEM IMPROVEMENTS FOR SELECTING INDUSTRIAL SURFACE CLEANING ALTERNATIVES

EPA Science Inventory

The paper describes computer software, called SAGE, that can provide not only cleaning recommendations but also general information on various surface cleaning options. In short, it is an advisory system which can provide users with vital information on the cleaning process optio...

Development of Statistical Process Control Methodology for an Environmentally Compliant Surface Cleaning Process in a Bonding Laboratory

NASA Technical Reports Server (NTRS)

Hutchens, Dale E.; Doan, Patrick A.; Boothe, Richard E.

1997-01-01

Bonding labs at both MSFC and the northern Utah production plant prepare bond test specimens which simulate or witness the production of NASA's Reusable Solid Rocket Motor (RSRM). The current process for preparing the bonding surfaces employs 1,1,1-trichloroethane vapor degreasing, which simulates the current RSRM process. Government regulations (e.g., the 1990 Amendments to the Clean Air Act) have mandated a production phase-out of a number of ozone depleting compounds (ODC) including 1,1,1-trichloroethane. In order to comply with these regulations, the RSRM Program is qualifying a spray-in-air (SIA) precision cleaning process using Brulin 1990, an aqueous blend of surfactants. Accordingly, surface preparation prior to bonding process simulation test specimens must reflect the new production cleaning process. The Bonding Lab Statistical Process Control (SPC) program monitors the progress of the lab and its capabilities, as well as certifies the bonding technicians, by periodically preparing D6AC steel tensile adhesion panels with EA-91 3NA epoxy adhesive using a standardized process. SPC methods are then used to ensure the process is statistically in control, thus producing reliable data for bonding studies, and identify any problems which might develop. Since the specimen cleaning process is being changed, new SPC limits must be established. This report summarizes side-by-side testing of D6AC steel tensile adhesion witness panels and tapered double cantilevered beams (TDCBs) using both the current baseline vapor degreasing process and a lab-scale spray-in-air process. A Proceco 26 inches Typhoon dishwasher cleaned both tensile adhesion witness panels and TDCBs in a process which simulates the new production process. The tests were performed six times during 1995, subsequent statistical analysis of the data established new upper control limits (UCL) and lower control limits (LCL). The data also demonstrated that the new process was equivalent to the vapor degreasing process.

Hydrogen desorption from hydrogen fluoride and remote hydrogen plasma cleaned silicon carbide (0001) surfaces

DOE Office of Scientific and Technical Information (OSTI.GOV)

King, Sean W., E-mail: sean.king@intel.com; Tanaka, Satoru; Davis, Robert F.

2015-09-15

Due to the extreme chemical inertness of silicon carbide (SiC), in-situ thermal desorption is commonly utilized as a means to remove surface contamination prior to initiating critical semiconductor processing steps such as epitaxy, gate dielectric formation, and contact metallization. In-situ thermal desorption and silicon sublimation has also recently become a popular method for epitaxial growth of mono and few layer graphene. Accordingly, numerous thermal desorption experiments of various processed silicon carbide surfaces have been performed, but have ignored the presence of hydrogen, which is ubiquitous throughout semiconductor processing. In this regard, the authors have performed a combined temperature programmed desorptionmore » (TPD) and x-ray photoelectron spectroscopy (XPS) investigation of the desorption of molecular hydrogen (H{sub 2}) and various other oxygen, carbon, and fluorine related species from ex-situ aqueous hydrogen fluoride (HF) and in-situ remote hydrogen plasma cleaned 6H-SiC (0001) surfaces. Using XPS, the authors observed that temperatures on the order of 700–1000 °C are needed to fully desorb C-H, C-O and Si-O species from these surfaces. However, using TPD, the authors observed H{sub 2} desorption at both lower temperatures (200–550 °C) as well as higher temperatures (>700 °C). The low temperature H{sub 2} desorption was deconvoluted into multiple desorption states that, based on similarities to H{sub 2} desorption from Si (111), were attributed to silicon mono, di, and trihydride surface species as well as hydrogen trapped by subsurface defects, steps, or dopants. The higher temperature H{sub 2} desorption was similarly attributed to H{sub 2} evolved from surface O-H groups at ∼750 °C as well as the liberation of H{sub 2} during Si-O desorption at temperatures >800 °C. These results indicate that while ex-situ aqueous HF processed 6H-SiC (0001) surfaces annealed at <700 °C remain terminated by some surface C–O and Si–O bonding, they may still exhibit significant chemical reactivity due to the creation of surface dangling bonds resulting from H{sub 2} desorption from previously undetected silicon hydride and surface hydroxide species.« less

Decontamination of Surfaces Exposed to Carbonbased Nanotubes and Nanomaterials

NASA Astrophysics Data System (ADS)

Karimi, Zahra

Contamination of surfaces by nanomaterials can happen due to accidental spillage and release or gradual accumulation during processing or handling. Considering the increasingly wide use of nanomaterials in industry and research labs and also taking into account the diversity of physical and chemical properties of different nanomaterials (such as solubility, aggregation/agglomeration, and surface reactivity), there is a pressing need to define reliable nanomaterial-specific decontamination guidelines. In this project, we propose and investigate a potential method for surface decontamination of carbon-based nanomaterials using solvent cleaning and wipes. The results show that the surfactant-assisted removal efficiencies of multi-walled carbon nanotubes, single walled carbon nantubes and single walled carbon nano-horns from silicon wafers through wiping is greater than 95%, 90% and 78%, respectively. The need for further studies to understand the mechanisms of nanomaterial removal from surfaces and development of standard techniques for surface decontamination of nanomaterials is highlighted. Another phase of experiments were performed to examine the efficiency of surfactants to remove multi-walled carbon nanotubes (MWCNTs) from silicon substrates with nano and microscaled features. In the first set of experiments, nanoscale features were induced on silicon wafers using SF6 and O2 plasma. Atomic force microscopy (AFM) was used to observe the surface topology and roughness. In the second set, well-defined microscale topological features were induced on silicon wafers using photo lithography and plasma etching. The etching time was varied to create semi-ellipsoidal pits with average diameter and height of ~ 7-9 microm, and ~ 1-3 microm, respectively. MWCNTs in the form of liquid solution were deposited on the surface of silicon wafers using the spin coating process. For the cleaning process, the contaminated surfaces were first sprayed with different types of surfactant or water. Then, the MWCNTs were wiped off using a simple wiping mechanism. The areal density of the MWCNTs was quantified prior to and after the removal using scanning electron microscopy (SEM) and post-image processing. For a surface featured with nanoscale asperities, the removal efficiency was measured to be in the range 83-99% based on substrate type and surface roughness. No evident relationship was observed between the etching time and the removal efficiency. For microscale features, increase of the etching time significantly decreases the removal efficiency.

Ion-Deposited Polished Coatings

NASA Technical Reports Server (NTRS)

Banks, B. A.

1986-01-01

Polished, dense, adherent coatings relatively free of imperfections. New process consists of using broad-beam ion source in evacuated chamber to ion-clean rotating surface that allows grazing incidence of ion beam. This sputter cleans off absorbed gases, organic contaminants, and oxides of mirror surface. In addition to cleaning, surface protrusions sputter-etched away. Process particularly adaptable to polishing of various substrates for optical or esthetic purposes.

Non-aqueous cleaning solvent substitution

NASA Technical Reports Server (NTRS)

Meier, Gerald J.

1994-01-01

A variety of environmental, safety, and health concerns exist over use of chlorinated and fluorinated cleaning solvents. Sandia National Laboratories, Lawrence Livermore National Laboratories, and the Kansas City Division of AlliedSignal have combined efforts to focus on finding alternative cleaning solvents and processes which are effective, environmentally safe, and compliant with local, state, and federal regulations. An alternative solvent has been identified, qualified, and implemented into production of complex electronic assemblies, where aqueous and semi-aqueous cleaning processes are not allowed. Extensive compatibility studies were performed with components, piece-parts, and materials. Electrical testing and accelerated aging were used to screen for detrimental, long-term effects. A terpene, d-limonene, was selected as the solvent of choice, and it was found to be compatible with the components and materials tested. A brief history of the overall project will be presented, along with representative cleaning efficiency results, compatibility results, and residual solvent data. The electronics industry is constantly searching for proven methods and environmentally-safe materials to use in manufacturing processes. The information in this presentation will provide another option to consider on future projects for applications requiring high levels of quality, reliability, and cleanliness from non-aqueous cleaning processes.

Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

NASA Astrophysics Data System (ADS)

Vadym, Prysiazhnyi; Pavel, Slavicek; Eliska, Mikmekova; Milos, Klima

2016-04-01

This paper is aimed to show the influence of initial chemical pretreatment prior to subsequent plasma activation of aluminum surfaces. The results of our study showed that the state of the topmost surface layer (i.e. the surface morphology and chemical groups) of plasma modified aluminum significantly depends on the chemical precleaning. Commonly used chemicals (isopropanol, trichlorethane, solution of NaOH in deionized water) were used as precleaning agents. The plasma treatments were done using a radio frequency driven atmospheric pressure plasma pencil developed at Masaryk University, which operates in Ar, Ar/O2 gas mixtures. The effectiveness of the plasma treatment was estimated by the wettability measurements, showing high wettability improvement already after 0.3 s treatment. The effects of surface cleaning (hydrocarbon removal), surface oxidation and activation (generation of OH groups) were estimated using infrared spectroscopy. The changes in the surface morphology were measured using scanning electron microscopy. Optical emission spectroscopy measurements in the near-to-surface region with temperature calculations showed that plasma itself depends on the sample precleaning procedure.

Strength and failure analysis of composite-to-composite adhesive bonds with different surface treatments

NASA Astrophysics Data System (ADS)

Paranjpe, Nikhil; Alamir, Mohammed; Alonayni, Abdullah; Asmatulu, Eylem; Rahman, Muhammad M.; Asmatulu, Ramazan

2018-03-01

Adhesives are widely utilized materials in aviation, automotive, energy, defense, and marine industries. Adhesive joints are gradually supplanting mechanical fasteners because they are lightweight structures, thus making the assembly lighter and easier. They also act as a sealant to prevent a structural joint from galvanic corrosion and leakages. Adhesive bonds provide high joint strength because of the fact that the load is distributed uniformly on the joint surface, while in mechanical joints, the load is concentrated at one point, thus leading to stress at that point and in turn causing joint failures. This research concentrated on the analysis of bond strength and failure loads in adhesive joint of composite-to-composite surfaces. Different durations of plasma along with the detergent cleaning were conducted on the composite surfaces prior to the adhesive applications and curing processes. The joint strength of the composites increased about 34% when the surface was plasma treated for 12 minutes. It is concluded that the combination of different surface preparations, rather than only one type of surface treatment, provides an ideal joint quality for the composites.

DC-pulse atmospheric-pressure plasma jet and dielectric barrier discharge surface treatments on fluorine-doped tin oxide for perovskite solar cell application

NASA Astrophysics Data System (ADS)

Tsai, Jui-Hsuan; Cheng, I.-Chun; Hsu, Cheng-Che; Chen, Jian-Zhang

2018-01-01

Nitrogen DC-pulse atmospheric-pressure plasma jet (APPJ) and nitrogen dielectric barrier discharge (DBD) were applied to pre-treat fluorine-doped tin oxide (FTO) glass substrates for perovskite solar cells (PSCs). Nitrogen DC-pulse APPJ treatment (substrate temperature: ~400 °C) for 10 s can effectively increase the wettability, whereas nitrogen DBD treatment (maximum substrate temperature: ~140 °C) achieved limited improvement in wettability even with increased treatment time of 60 s. XPS results indicate that 10 s APPJ, 60 s DBD, and 15 min UV-ozone treatment of FTO glass substrates can decontaminate the surface. A PSC fabricated on APPJ-treated FTO showed the highest power conversion efficiency (PCE) of 14.90%; by contrast, a PSC with nitrogen DBD-treated FTO shows slightly lower PCE of 12.57% which was comparable to that of a PSC on FTO treated by a 15 min UV-ozone process. Both nitrogen DC-pulse APPJ and nitrogen DBD can decontaminate FTO substrates and can be applied for the substrate cleaning step of PSC.

Work functions of hafnium nitride thin films as emitter material for field emitter arrays

DOE Office of Scientific and Technical Information (OSTI.GOV)

Gotoh, Yasuhito, E-mail: gotoh.yasuhito.5w@kyoto-u.ac.jp; Fujiwara, Sho; Tsuji, Hiroshi

The work functions of hafnium nitride thin films prepared by radio-frequency magnetron sputtering were investigated in vacuum, before and after surface cleaning processes, with a view of improving the properties of as-fabricated field emitter arrays comprising hafnium nitride emitters. The measurement of the work function was first performed for the as-deposited films and then for films subjected to surface cleaning process, either thermal treatment or ion bombardment. Thermal treatment at a maximum temperature of 300 °C reduced the work function by 0.7 eV. Once the film was heated, the work function maintained the reduced value, even after cooling to room temperature. Amore » little change in the work function was observed for the second and third thermal treatments. The ion bombardment was conducted by exposing the sample to a thin plasma for different sample bias conditions and processing times. When the sample was biased at −10 V, the work function decreased by 0.6 eV. The work function reduction became saturated in the early stage of the ion bombardment. When the sample was biased at −50 V, the work function exhibited different behaviors, that is, first it decreased rapidly and then increased in response to the increase in processing time. The lowest attainable work function was found to be 4.00 eV. It should be noted that none of the work function values reported in this paper were obtained using surfaces that were demonstrated to be free from oxygen contamination. The present results suggest that the current–voltage characteristics of a field emitter array can be improved by a factor of 25–50 by the examined postprocesses.« less

Development of megasonic cleaning for silicon wafers

NASA Technical Reports Server (NTRS)

Mayer, A.

1980-01-01

A cleaning and drying system for processing at least 2500 three in. diameter wafers per hour was developed with a reduction in process cost. The system consists of an ammonia hydrogen peroxide bath in which both surfaces of 3/32 in. spaced, ion implanted wafers are cleaned in quartz carriers moved on a belt past two pairs of megasonic transducers. The wafers are dried in the novel room temperature, high velocity air dryer in the same carriers used for annealing. A new laser scanner was used effectively to monitor the cleaning ability on a sampling basis.

Latest technologies on ultrasonic cleaning

NASA Astrophysics Data System (ADS)

Hofstetter, Hans U.

2007-05-01

UCM-AG manufactures Ultrasonic Cleaning Machines for highest quality requirements. The company has the know-how for cleaning and supplies cleaning systems together with the cleaning process. With a UCM of Switzerland Cleaning System, the customer gets the system itself, the cleaning process with a guarantee for the specified result but also all auxiliary equipment needed for perfect results. Therefore UCM also supplies fixtures, linkage to existing automated fabrication facilities water treatment plants etc. Thus the UCM customer gets a turnkey installation - ready to operate and including know-how. UCM of Switzerland will describe the latest technology in ultrasonic precision cleaning on the example of a recent and sophisticated installation. The installation consists of three interlinked cleaning systems which operate completely automated. The 1st system is designed for pre-cleaning to remove waxes, pitch and protection lacquers with environmentally friendly solvents which are non hazardous to the health of the operators. The 2nd system cleans the parts prior to inspection and operates with neutral or slightly alkaline detergents. The 3rd system is designed for final cleaning prior to vacuum coating and perfect results are required. It combines cleaning tanks and DI-Water rinse with lift out and vacuum dryer. The installation combines the latest technologies in ultrasonic cleaning for precision optical components. The system employs multi frequency immersed ultrasonic transducers and special rinsing technologies The complete installation will be explained in detail; the concept in its whole, the lay out, the particular setup of each cleaning system etc. will be shown and explained together with construction particulars of the complete installation.

40 CFR 463.20 - Applicability; description of the cleaning water subcategory.

Code of Federal Regulations, 2010 CFR

2010-07-01

... (CONTINUED) EFFLUENT GUIDELINES AND STANDARDS PLASTICS MOLDING AND FORMING POINT SOURCE CATEGORY Cleaning... the cleaning water subcategory are processes where water comes in contact with the plastic product for... equipment, such as molds and mandrels, that contact the plastic material for the purpose of cleaning the...

Plasma-enhanced synthesis of green flame retardant cellulosic materials

NASA Astrophysics Data System (ADS)

Totolin, Vladimir

The natural fiber-containing fabrics and composites are more environmentally friendly, and are used in transportation (automobiles, aerospace), military applications, construction industries (ceiling paneling, partition boards), consumer products, etc. Therefore, the flammability characteristics of the composites based on polymers and natural fibers play an important role. This dissertation presents the development of plasma assisted - green flame retardant coatings for cellulosic substrates. The overall objective of this work was to generate durable flame retardant treatment on cellulosic materials. In the first approach sodium silicate layers were pre-deposited onto clean cotton substrates and cross linked using low pressure, non-equilibrium oxygen plasma. A statistical design of experiments was used to optimize the plasma parameters. The modified cotton samples were tested for flammability using an automatic 45° angle flammability test chamber. Aging tests were conducted to evaluate the coating resistance during the accelerated laundry technique. The samples revealed a high flame retardant behavior and good thermal stability proved by thermo-gravimetric analysis. In the second approach flame retardant cellulosic materials have been produced using a silicon dioxide (SiO2) network coating. SiO 2 network armor was prepared through hydrolysis and condensation of the precursor tetraethyl orthosilicate (TEOS), prior coating the substrates, and was cross linked on the surface of the substrates using atmospheric pressure plasma (APP) technique. Due to protection effects of the SiO2 network armor, the cellulosic based fibers exhibit enhanced thermal properties and improved flame retardancy. In the third approach, the TEOS/APP treatments were extended to linen fabrics. The thermal analysis showed a higher char content and a strong endothermic process of the treated samples compared with control ones, indicating a good thermal stability. Also, the surface analysis proved the existence of the silica-based coatings on all treated cellulosic substrates after intense ultrasound washes. The results obtained in this work allow us to conclude that silica-based coatings used in conjunction with plasma processes have high potential to obtain green flame retardant cellulosic materials with potential applications in the development of upholstered furniture, clothing and military applications.

Dawn Spacecraft Processing

NASA Image and Video Library

2007-04-10

In clean room C of Astrotech's Payload Processing Facility, a worker wearing a "bunny suit," or clean-room attire, begins removing the protective cover surrounding the Dawn spacecraft. In the clean room, the spacecraft will undergo further processing. Dawn's mission is to explore two of the asteroid belt's most intriguing and dissimilar occupants: asteroid Vesta and the dwarf planet Ceres. The Dawn mission is managed by JPL, a division of the California Institute of Technology in Pasadena, for NASA's Science Mission Directorate in Washington, D.C.

Dawn Spacecraft Processing

NASA Image and Video Library

2007-04-10

In clean room C of Astrotech's Payload Processing Facility, a worker wearing a "bunny suit," or clean-room attire, looks over the Dawn spacecraft after removing the protective cover, at bottom right. In the clean room, the spacecraft will undergo further processing. Dawn's mission is to explore two of the asteroid belt's most intriguing and dissimilar occupants: asteroid Vesta and the dwarf planet Ceres. The Dawn mission is managed by JPL, a division of the California Institute of Technology in Pasadena, for NASA's Science Mission Directorate in Washington, D.C.

NASA Principal Center for Review of Clean Air Act Regulations

NASA Technical Reports Server (NTRS)

Clark-Ingram, Marceia; Munafo, Paul M. (Technical Monitor)

2002-01-01

The Clean Air Act (CAA) regulations have greatly impacted materials and processes utilized in the manufacture of aerospace hardware. Code JE/ NASA's Environmental Management Division at NASA Headquarters recognized the need for a formal, Agency-wide review process of CAA regulations. Marshall Space Flight Center (MSFC) was selected as the 'Principal Center for Review of Clean Air Act Regulations'. This presentation describes the centralized support provided by MSFC for the management and leadership of NASA's CAA regulation review process.

Development of a new plasma reactor for propene removal

NASA Astrophysics Data System (ADS)

Oukacine, Linda; Tatibouët, Jean-Michel

2008-10-01

The purpose of the study is to develop a new plasma reactor being applied to gas phase pollution abatement, involving a surface dielectric barrier discharge (SDBD) at atmospheric pressure. Propene was chosen as a model pollutant. The system can associate a SDBD with a volume dielectric barrier discharge (VDBD). A specific catalyst can be placed in post-plasma site in order to destroy the residual ozone after use it as a strong oxidant for total oxidation of propene and by-products formed by the plasma reactor. A comparative study has been established between the propene removal efficiency of these two plasma geometries. The results demonstrate that SDBD is a promising system for gas cleaning. The experiments show that ozone production depends on plasma system configuration and indicate the effectiveness of combining SDBD and VDBD. The NOx formation remains very low, whereas ozone formation is the highest for the SDBD. The influence of some materials on the propene removal and the ozone production were studied.

Laser cleaning of ITER's diagnostic mirrors

NASA Astrophysics Data System (ADS)

Skinner, C. H.; Gentile, C. A.; Doerner, R.

2012-10-01

Practical methods to clean ITER's diagnostic mirrors and restore reflectivity will be critical to ITER's plasma operations. We report on laser cleaning of single crystal molybdenum mirrors coated with either carbon or beryllium films 150 - 420 nm thick. A 1.06 μm Nd laser system provided 220 ns pulses at 8 kHz with typical power densities of 1-2 J/cm^2. The laser beam was fiber optically coupled to a scanner suitable for tokamak applications. The efficacy of mirror cleaning was assessed with a new technique that combines microscopic imaging and reflectivity measurements [1]. The method is suitable for hazardous materials such as beryllium as the mirrors remain sealed in a vacuum chamber. Excellent restoration of reflectivity for the carbon coated Mo mirrors was observed after laser scanning under vacuum conditions. For the beryllium coated mirrors restoration of reflectivity has so far been incomplete and modeling indicates that a shorter duration laser pulse is needed. No damage of the molybdenum mirror substrates was observed.[4pt][1] C.H. Skinner et al., Rev. Sci. Instrum. at press.

Pedestal cleaning for high laser pulse contrast ratio with a 100 TW class laser system.

PubMed

Fourmaux, S; Payeur, S; Buffechoux, S; Lassonde, P; St-Pierre, C; Martin, F; Kieffer, J C

2011-04-25

Laser matter interaction at relativistic intensities using 100 TW class laser systems or higher is becoming more and more widespread. One of the critical issues of such laser systems is to let the laser pulse interact at high intensity with the solid target and avoid any pre-plasma. Thus, a high Laser Pulse Contrast Ratio (LPCR) parameter is of prime importance. We present the LPCR characterization of a high repetition 100 TW class laser system. We demonstrate that the generated Amplified Spontaneous Emission (ASE) degrades the overall LPCR performance. We propose a simple way to clean the pulse after the first amplification stage by introducing a solid state saturable absorber which results in a LPCR improvement to better than 10(10) with only a 30% energy loss at a 10 Hz repetition rate. We finally correlated this cleaning method with experimental results.

Cryogenic Cathode Cooling Techniques for Improved SABRE Extraction Ion Diode Li Beam Generation

NASA Astrophysics Data System (ADS)

Hanson, D. L.; Johnston, R. R.; Cuneo, M. E.; Menge, P. R.; Fowler, W. E.; Armijo, J.; Nielsen, D. S.; Petmecky, D.

1997-11-01

We are developing techniques for cryogenic cooling of the SABRE extraction ion diode cathode that, combined with source cleaning, should improve the purity and brightness of Li beams for ICF light ion fusion. By liquid helium (LHe) cathode cooling, we have been able to maintain A-K gap base pressures in the range of 5 - 7x10-8 Torr for about 45 minutes. These base pressures extend the monolayer formation time for the worst beam contaminants (H2 and water vapor) to 10 - 100 sec or longer, which should allow the accelerator to be fired without significant Li source recontamination. This technique is compatible with He glow discharge cleaning, laser cleaning, and in situ Li deposition. We are also developing techniques for Ti-gettering of H2 and for cryogenic cooling of cathode electrodes to delay cathode plasma expansion.

Advanced Research Deposition System (ARDS) for processing CdTe solar cells

NASA Astrophysics Data System (ADS)

Barricklow, Keegan Corey

CdTe solar cells have been commercialized at the Gigawatt/year level. The development of volume manufacturing processes for next generation CdTe photovoltaics (PV) with higher efficiencies requires research systems with flexibility, scalability, repeatability and automation. The Advanced Research Deposition Systems (ARDS) developed by the Materials Engineering Laboratory (MEL) provides such a platform for the investigation of materials and manufacturing processes necessary to produce the next generation of CdTe PV. Limited by previous research systems, the ARDS was developed to provide process and hardware flexibility, accommodating advanced processing techniques, and capable of producing device quality films. The ARDS is a unique, in-line process tool with nine processing stations. The system was designed, built and assembled at the Materials Engineering Laboratory. Final assembly, startup, characterization and process development are the focus of this research. Many technical challenges encountered during the startup of the ARDS were addressed in this research. In this study, several hardware modifications needed for the reliable operation of the ARDS were designed, constructed and successfully incorporated into the ARDS. The effect of process condition on film properties for each process step was quantified. Process development to achieve 12% efficient baseline solar cell required investigation of discrete processing steps, troubleshooting process variation, and developing performance correlations. Subsequent to this research, many advances have been demonstrated with the ARDS. The ARDS consistently produces devices of 12% +/-.5% by the process of record (POR). The champion cell produced to date utilizing the ARDS has an efficiency of 16.2% on low cost commercial sodalime glass and utilizes advanced films. The ARDS has enabled investigation of advanced concepts for processing CdTe devices including, Plasma Cleaning, Plasma Enhanced Closed Space Sublimation (PECSS), Electron Reflector (ER) using Cd1-xMgxTe (CMT) structure and alternative device structures. The ARDS has been instrumental in the collaborative research with many institutions.

KENNEDY SPACE CENTER, FLA. - A KSC employee secures a foot and leg cover of his "bunny suit," part of standard clean room apparel, before entering a clean room. The apparel is designed to cover the hair, clothing and shoes of employees to prevent particulate matter from contaminating the space flight hardware being stored or processed in the clean room and is one aspect of KSC's Foreign Object Debris (FOD) control program, an important safety initiative.

NASA Image and Video Library

2003-08-29

KENNEDY SPACE CENTER, FLA. - A KSC employee secures a foot and leg cover of his "bunny suit," part of standard clean room apparel, before entering a clean room. The apparel is designed to cover the hair, clothing and shoes of employees to prevent particulate matter from contaminating the space flight hardware being stored or processed in the clean room and is one aspect of KSC's Foreign Object Debris (FOD) control program, an important safety initiative.

KENNEDY SPACE CENTER, FLA. - A KSC employee dons the head and face cover of a "bunny suit," part of standard clean room apparel, before entering a clean room. This apparel is designed to cover the hair, clothing and shoes of employees to prevent particulate matter from contaminating the space flight hardware being stored or processed in the clean room and is one aspect of KSC's Foreign Object Debris (FOD) control program, an important safety initiative.

NASA Image and Video Library

2003-08-29

KENNEDY SPACE CENTER, FLA. - A KSC employee dons the head and face cover of a "bunny suit," part of standard clean room apparel, before entering a clean room. This apparel is designed to cover the hair, clothing and shoes of employees to prevent particulate matter from contaminating the space flight hardware being stored or processed in the clean room and is one aspect of KSC's Foreign Object Debris (FOD) control program, an important safety initiative.

KENNEDY SPACE CENTER, FLA. - A KSC employee dons the coverall of a "bunny suit," part of standard clean room apparel, before entering a clean room. The apparel is designed to cover the hair, clothing and shoes of employees to prevent particulate matter from contaminating the space flight hardware being stored or processed in the clean room and is one aspect of KSC's Foreign Object Debris (FOD) control program, an important safety initiative.

NASA Image and Video Library

2003-08-29

KENNEDY SPACE CENTER, FLA. - A KSC employee dons the coverall of a "bunny suit," part of standard clean room apparel, before entering a clean room. The apparel is designed to cover the hair, clothing and shoes of employees to prevent particulate matter from contaminating the space flight hardware being stored or processed in the clean room and is one aspect of KSC's Foreign Object Debris (FOD) control program, an important safety initiative.

KENNEDY SPACE CENTER, FLA. - A KSC employee dons the foot and leg covers of a "bunny suit," part of standard clean room apparel, before entering a clean room. The apparel is designed to cover the hair, clothing and shoes of employees to prevent particulate matter from contaminating the space flight hardware being stored or processed in the clean room and is one aspect of KSC's Foreign Object Debris (FOD) control program, an important safety initiative.

NASA Image and Video Library

2003-08-29

KENNEDY SPACE CENTER, FLA. - A KSC employee dons the foot and leg covers of a "bunny suit," part of standard clean room apparel, before entering a clean room. The apparel is designed to cover the hair, clothing and shoes of employees to prevent particulate matter from contaminating the space flight hardware being stored or processed in the clean room and is one aspect of KSC's Foreign Object Debris (FOD) control program, an important safety initiative.

Staying sticky: contact self-cleaning of gecko-inspired adhesives.

PubMed

Mengüç, Yigit; Röhrig, Michael; Abusomwan, Uyiosa; Hölscher, Hendrik; Sitti, Metin

2014-05-06

The exceptionally adhesive foot of the gecko remains clean in dirty environments by shedding contaminants with each step. Synthetic gecko-inspired adhesives have achieved similar attachment strengths to the gecko on smooth surfaces, but the process of contact self-cleaning has yet to be effectively demonstrated. Here, we present the first gecko-inspired adhesive that has matched both the attachment strength and the contact self-cleaning performance of the gecko's foot on a smooth surface. Contact self-cleaning experiments were performed with three different sizes of mushroom-shaped elastomer microfibres and five different sizes of spherical silica contaminants. Using a load-drag-unload dry contact cleaning process similar to the loads acting on the gecko foot during locomotion, our fully contaminated synthetic gecko adhesives could recover lost adhesion at a rate comparable to that of the gecko. We observed that the relative size of contaminants to the characteristic size of the microfibres in the synthetic adhesive strongly determined how and to what degree the adhesive recovered from contamination. Our approximate model and experimental results show that the dominant mechanism of contact self-cleaning is particle rolling during the drag process. Embedding of particles between adjacent fibres was observed for particles with diameter smaller than the fibre tips, and further studied as a temporary cleaning mechanism. By incorporating contact self-cleaning capabilities, real-world applications of synthetic gecko adhesives, such as reusable tapes, clothing closures and medical adhesives, would become feasible.

Staying sticky: contact self-cleaning of gecko-inspired adhesives

PubMed Central

Mengüç, Yiğit; Röhrig, Michael; Abusomwan, Uyiosa; Hölscher, Hendrik; Sitti, Metin

2014-01-01

The exceptionally adhesive foot of the gecko remains clean in dirty environments by shedding contaminants with each step. Synthetic gecko-inspired adhesives have achieved similar attachment strengths to the gecko on smooth surfaces, but the process of contact self-cleaning has yet to be effectively demonstrated. Here, we present the first gecko-inspired adhesive that has matched both the attachment strength and the contact self-cleaning performance of the gecko's foot on a smooth surface. Contact self-cleaning experiments were performed with three different sizes of mushroom-shaped elastomer microfibres and five different sizes of spherical silica contaminants. Using a load–drag–unload dry contact cleaning process similar to the loads acting on the gecko foot during locomotion, our fully contaminated synthetic gecko adhesives could recover lost adhesion at a rate comparable to that of the gecko. We observed that the relative size of contaminants to the characteristic size of the microfibres in the synthetic adhesive strongly determined how and to what degree the adhesive recovered from contamination. Our approximate model and experimental results show that the dominant mechanism of contact self-cleaning is particle rolling during the drag process. Embedding of particles between adjacent fibres was observed for particles with diameter smaller than the fibre tips, and further studied as a temporary cleaning mechanism. By incorporating contact self-cleaning capabilities, real-world applications of synthetic gecko adhesives, such as reusable tapes, clothing closures and medical adhesives, would become feasible. PMID:24554579

Material Surface Characteristics and Plasma Performance in the Lithium Tokamak Experiment

NASA Astrophysics Data System (ADS)

Lucia, Matthew James

The performance of a tokamak plasma and the characteristics of the surrounding plasma facing component (PFC) material surfaces strongly influence each other. Despite this relationship, tokamak plasma physics has historically been studied more thoroughly than PFC surface physics. The disparity is particularly evident in lithium PFC research: decades of experiments have examined the effect of lithium PFCs on plasma performance, but the understanding of the lithium surface itself is much less complete. This latter information is critical to identifying the mechanisms by which lithium PFCs affect plasma performance. This research focused on such plasma-surface interactions in the Lithium Tokamak Experiment (LTX), a spherical torus designed to accommodate solid or liquid lithium as the primary PFC. Surface analysis was accomplished via the novel Materials Analysis and Particle Probe (MAPP) diagnostic system. In a series of experiments on LTX, the MAPP x-ray photoelectron spectroscopy (XPS) and thermal desorption spectroscopy (TDS) capabilities were used for in vacuo interrogation of PFC samples. This represented the first application of XPS and TDS for in situ surface analysis of tokamak PFCs. Surface analysis indicated that the thin (dLi ˜ 100nm) evaporative lithium PFC coatings in LTX were converted to Li2O due to oxidizing agents in both the residual vacuum and the PFC substrate. Conversion was rapid and nearly independent of PFC temperature, forming a majority Li2O surface within minutes and an entirely Li2O surface within hours. However, Li2O PFCs were still capable of retaining hydrogen and sequestering impurities until the Li2 O was further oxidized to LiOH, a process that took weeks. For hydrogen retention, Li2O PFCs retained H+ from LTX plasma discharges, but no LiH formation was observed. Instead, results implied that H+ was only weakly-bound, such that it almost completely outgassed as H 2 within minutes. For impurity sequestration, LTX plasma performance---ascertained from plasma current and density measurements---progressively improved as plasma carbon and oxygen impurity levels fell. This was true for PFC conditioning by vacuum baking and argon glow discharge cleaning, as well as by lithium evaporation. Some evidence suggested that impurity sequestration was more important than hydrogen retention in enhancing LTX plasma performance. In contrast with expectations for lithium PFCs, heating the Li2 O PFCs in LTX caused increased plasma impurity levels that tended to reduce plasma performance.

Enhanced Chemical Cleaning: A New Process for Chemically Cleaning Savannah River Waste Tanks

DOE Office of Scientific and Technical Information (OSTI.GOV)

Ketusky, Edward; Spires, Renee; Davis, Neil

2009-02-11

At the Savannah River Site (SRS) there are 49 High Level Waste (HLW) tanks that eventually must be emptied, cleaned, and closed. The current method of chemically cleaning SRS HLW tanks, commonly referred to as Bulk Oxalic Acid Cleaning (BOAC), requires about a half million liters (130,000 gallons) of 8 weight percent (wt%) oxalic acid to clean a single tank. During the cleaning, the oxalic acid acts as the solvent to digest sludge solids and insoluble salt solids, such that they can be suspended and pumped out of the tank. Because of the volume and concentration of acid used, amore » significant quantity of oxalate is added to the HLW process. This added oxalate significantly impacts downstream processing. In addition to the oxalate, the volume of liquid added competes for the limited available tank space. A search, therefore, was initiated for a new cleaning process. Using TRIZ (Teoriya Resheniya Izobretatelskikh Zadatch or roughly translated as the Theory of Inventive Problem Solving), Chemical Oxidation Reduction Decontamination with Ultraviolet Light (CORD-UV{reg_sign}), a mature technology used in the commercial nuclear power industry was identified as an alternate technology. Similar to BOAC, CORD-UV{reg_sign} also uses oxalic acid as the solvent to dissolve the metal (hydr)oxide solids. CORD-UV{reg_sign} is different, however, since it uses photo-oxidation (via peroxide/UV or ozone/UV to form hydroxyl radicals) to decompose the spent oxalate into carbon dioxide and water. Since the oxalate is decomposed and off-gassed, CORD-UV{reg_sign} would not have the negative downstream oxalate process impacts of BOAC. With the oxalate destruction occurring physically outside the HLW tank, re-precipitation and transfer of the solids, as well as regeneration of the cleaning solution can be performed without adding additional solids, or a significant volume of liquid to the process. With a draft of the pre-conceptual Enhanced Chemical Cleaning (ECC) flowsheet, taking full advantage of the many CORD-UV{reg_sign} benefits, performance demonstration testing was initiated using available SRS sludge simulant. The demonstration testing confirmed that ECC is a viable technology, as it can dissolve greater than 90% of the sludge simulant and destroy greater than 90% of the oxalates. Additional simulant and real waste testing are planned.« less

Effects of cleaning methods upon preservation of stable isotopes and trace elements in shells of Cyprideis torosa (Crustacea, Ostracoda): Implications for palaeoenvironmental reconstruction

NASA Astrophysics Data System (ADS)

Roberts, L. R.; Holmes, J. A.; Leng, M. J.; Sloane, H. J.; Horne, D. J.

2018-06-01

The trace element (Sr/Ca and Mg/Ca) and stable isotope (δ18O and δ13C) geochemistry of fossil ostracod valves provide valuable information, particularly in lacustrine settings, on palaeo-water composition and palaeotemperature. The removal of sedimentary and organic contamination prior to geochemical analysis is essential to avoid bias of the results. Previous stable isotope and trace element work on ostracod shells has, however, employed different treatments for the removal of contamination beyond simple 'manual' cleaning using a paint brush and methanol under a low-power binocular microscope. For isotopic work pre-treatments include chemical oxidation, vacuum roasting and plasma ashing, and for trace element work sonication, chemical oxidation and reductive cleaning. The impact of different treatments on the geochemical composition of the valve calcite has not been evaluated in full, and a universal protocol has not been established. Here, a systematic investigation of the cleaning methods is undertaken using specimens of the ubiquitous euryhaline species, Cyprideis torosa. Cleaning methods are evaluated by undertaking paired analyses on a single carapace (comprising two valves); in modern ostracods, whose valves are assumed to be unaltered, the two valves should have identical geochemical and isotopic composition. Hence, when one valve is subjected to the chosen treatment and the other to simple manual cleaning any difference in composition can confidently be assigned to the treatment method. We show that certain cleaning methods have the potential to cause alteration to the geochemical signal, particularly Mg/Ca and δ18O, and hence have implications for palaeoenvironmental reconstructions. For trace-element determinations we recommend cleaning by sonication and for stable isotope analysis, oxidation by hydrogen peroxide. These methods remove contamination, yet do not significantly alter the geochemical signal.

15 CFR 30.70 - Violation of the Clean Diamond Trade Act.

Code of Federal Regulations, 2013 CFR

2013-01-01

... 15 Commerce and Foreign Trade 1 2013-01-01 2013-01-01 false Violation of the Clean Diamond Trade... Clean Diamond Trade Act. Public Law 108-19, the Clean Diamond Trade Act (the Act), section 8(c... diamonds, including those with respect to the validation of the Kimberley Process Certificate by the...

15 CFR 30.70 - Violation of the Clean Diamond Trade Act.

Code of Federal Regulations, 2012 CFR

2012-01-01

... 15 Commerce and Foreign Trade 1 2012-01-01 2012-01-01 false Violation of the Clean Diamond Trade... Clean Diamond Trade Act. Public Law 108-19, the Clean Diamond Trade Act (the Act), section 8(c... diamonds, including those with respect to the validation of the Kimberley Process Certificate by the...

15 CFR 30.70 - Violation of the Clean Diamond Trade Act.

Code of Federal Regulations, 2010 CFR

2010-01-01

... 15 Commerce and Foreign Trade 1 2010-01-01 2010-01-01 false Violation of the Clean Diamond Trade... Clean Diamond Trade Act. Public Law 108-19, the Clean Diamond Trade Act (the Act), section 8(c... diamonds, including those with respect to the validation of the Kimberley Process Certificate by the...

15 CFR 30.70 - Violation of the Clean Diamond Trade Act.

Code of Federal Regulations, 2014 CFR

2014-01-01

... 15 Commerce and Foreign Trade 1 2014-01-01 2014-01-01 false Violation of the Clean Diamond Trade... Clean Diamond Trade Act. Public Law 108-19, the Clean Diamond Trade Act (the Act), section 8(c... diamonds, including those with respect to the validation of the Kimberley Process Certificate by the...

Machine Cleans And Degreases Without Toxic Solvents

NASA Technical Reports Server (NTRS)

Gurguis, Kamal S.; Higginson, Gregory A.

1993-01-01

Appliance uses hot water and biodegradable chemicals to degrease and clean hardware. Spray chamber essentially industrial-scale dishwasher. Front door tilts open, and hardware to be cleaned placed on basket-like tray. During cleaning process, basket-like tray rotates as high-pressure "V" jets deliver steam, hot water, detergent solution, and rust inhibitor as required.

Effect of SPM-based cleaning POR on EUV mask performance

NASA Astrophysics Data System (ADS)

Choi, Jaehyuck; Lee, Han-shin; Yoon, Jinsang; Shimomura, Takeya; Friz, Alex; Montgomery, Cecilia; Ma, Andy; Goodwin, Frank; Kang, Daehyuk; Chung, Paul; Shin, Inkyun; Cho, H.

2011-11-01

EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality and patterning performance can change during mask fabrication, EUV exposure, maintenance cleaning, shipping, or storage. The fact that a pellicle is not used to protect the mask surface in EUV lithography suggests that EUV masks may have to undergo more cleaning cycles during their lifetime. More frequent cleaning, combined with the adoption of new materials for EUV masks, necessitates that mask manufacturers closely examine the performance change of EUV masks during cleaning process. We have investigated EUV mask quality and patterning performance during 30 cycles of Samsung's EUV mask SPM-based cleaning and 20 cycles of SEMATECH ADT exposure. We have observed that the quality and patterning performance of EUV masks does not significantly change during these processes except mask pattern CD change. To resolve this issue, we have developed an acid-free cleaning POR and substantially improved EUV mask film loss compared to the SPM-based cleaning POR.

Gold cleaning methods for preparation of cell culture surfaces for self-assembled monolayers of zwitterionic oligopeptides.

PubMed

Enomoto, Junko; Kageyama, Tatsuto; Myasnikova, Dina; Onishi, Kisaki; Kobayashi, Yuka; Taruno, Yoko; Kanai, Takahiro; Fukuda, Junji

2018-05-01

Self-assembled monolayers (SAMs) have been used to elucidate interactions between cells and material surface chemistry. Gold surfaces modified with oligopeptide SAMs exhibit several unique characteristics, such as cell-repulsive surfaces, micropatterns of cell adhesion and non-adhesion regions for control over cell microenvironments, and dynamic release of cells upon external stimuli under culture conditions. However, basic procedures for the preparation of oligopeptide SAMs, including appropriate cleaning methods of the gold surface before modification, have not been fully established. Because gold surfaces are readily contaminated with organic compounds in the air, cleaning methods may be critical for SAM formation. In this study, we examined the effects of four gold cleaning methods: dilute aqua regia, an ozone water, atmospheric plasma, and UV irradiation. Among the methods, UV irradiation most significantly improved the formation of oligopeptide SAMs in terms of repulsion of cells on the surfaces. We fabricated an apparatus with a UV light source, a rotation table, and HEPA filter, to treat a number of gold substrates simultaneously. Furthermore, UV-cleaned gold substrates were capable of detaching cell sheets without serious cell injury. This may potentially provide a stable and robust approach to oligopeptide SAM-based experiments for biomedical studies. Copyright © 2017 The Society for Biotechnology, Japan. Published by Elsevier B.V. All rights reserved.

Laser cleaning of steel for paint removal

NASA Astrophysics Data System (ADS)

Chen, G. X.; Kwee, T. J.; Tan, K. P.; Choo, Y. S.; Hong, M. H.

2010-11-01

Paint removal is an important part of steel processing for marine and offshore engineering. For centuries, a blasting techniques have been widely used for this surface preparation purpose. But conventional blasting always has intrinsic problems, such as noise, explosion risk, contaminant particles, vibration, and dust. In addition, processing wastes often cause environmental problems. In recent years, laser cleaning has attracted much research effort for its significant advantages, such as precise treatment, and high selectivity and flexibility in comparison with conventional cleaning techniques. In the present study, we use this environmentally friendly technique to overcome the problems of conventional blasting. Processed samples are examined with optical microscopes and other surface characterization tools. Experimental results show that laser cleaning can be a good alternative candidate to conventional blasting.

Implementation of environmentally compliant cleaning and insulation bonding for MNASA

NASA Technical Reports Server (NTRS)

Hutchens, Dale E.; Keen, Jill M.; Smith, Gary M.; Dillard, Terry W.; Deweese, C. Darrell; Lawson, Seth W.

1995-01-01

Historically, many subscale and full-scale rocket motors have employed environmentally and physiologically harmful chemicals during the manufacturing process. This program examines the synergy and interdependency between environmentally acceptable materials for solid rocket motor insulation applications, bonding, corrosion inhibiting, painting, priming, and cleaning, and then implements new materials and processes in subscale motors. Tests have been conducted to eliminate or minimize hazardous chemicals used in the manufacture of modified-NASA materials test motor (MNASA) components and identify alternate materials and/or processes following NASA Operational Environmental Team (NOET) priorities. This presentation describes implementation of high pressure water refurbishment cleaning, aqueous precision cleaning using both Brulin 815 GD and Jettacin, and insulation case bonding using ozone depleting chemical (ODC) compliant primers and adhesives.

Simple, green, and clean removal of a poly(methyl methacrylate) film on chemical vapor deposited graphene

NASA Astrophysics Data System (ADS)

Park, J.-H.; Jung, W.; Cho, D.; Seo, J.-T.; Moon, Y.; Woo, S. H.; Lee, C.; Park, C.-Y.; Ahn, J. R.

2013-10-01

The clean removal of a poly(methyl methacrylate) (PMMA) film on graphene has been an essential part of the process of transferring chemical vapor deposited graphene to a specific substrate, influencing the quality of the transferred graphene. Here we demonstrate that the clean removal of PMMA can be achieved by a single heat-treatment process without the chemical treatment that was adopted in other methods of PMMA removal. The cleanness of the transferred graphene was confirmed by four-point probe measurements, synchrotron radiation x-ray photoemission spectroscopy, optical images, and Raman spectroscopy.

CPICOR{trademark}: Clean power from integrated coal-ore reduction

DOE Office of Scientific and Technical Information (OSTI.GOV)

Wintrell, R.; Miller, R.N.; Harbison, E.J.

1997-12-31

The US steel industry, in order to maintain its basic iron production, is thus moving to lower coke requirements and to the cokeless or direct production of iron. The US Department of Energy (DOE), in its Clean Coal Technology programs, has encouraged the move to new coal-based technology. The steel industry, in its search for alternative direct iron processes, has been limited to a single process, COREX{reg_sign}. The COREX{reg_sign} process, though offering commercial and environmental acceptance, produces a copious volume of offgas which must be effectively utilized to ensure an economical process. This volume, which normally exceeds the internal needsmore » of a single steel company, offers a highly acceptable fuel for power generation. The utility companies seeking to offset future natural gas cost increases are interested in this clean fuel. The COREX{reg_sign} smelting process, when integrated with a combined cycle power generation facility (CCPG) and a cryogenic air separation unit (ASU), is an outstanding example of a new generation of environmentally compatible and highly energy efficient Clean Coal Technologies. This combination of highly integrated electric power and hot metal coproduction, has been designated CPICOR{trademark}, Clean Power from Integrated Coal/Ore Reduction.« less

Rudimentary Cleaning Compared to Level 300A

NASA Technical Reports Server (NTRS)

Arpin, Christina Y. Pina; Stoltzfus, Joel

2012-01-01

A study was done to characterize the cleanliness level achievable when using a rudimentary cleaning process, and results were compared to JPR 5322.1G Level 300A. While it is not ideal to clean in a shop environment, some situations (e.g., field combat operations) require oxygen system hardware to be maintained and cleaned to prevent a fire hazard, even though it cannot be sent back to a precision cleaning facility. This study measured the effectiveness of basic shop cleaning. Initially, three items representing parts of an oxygen system were contaminated: a metal plate, valve body, and metal oxygen bottle. The contaminants chosen were those most likely to be introduced to the system during normal use: oil, lubricant, metal shavings/powder, sand, fingerprints, tape, lip balm, and hand lotion. The cleaning process used hot water, soap, various brushes, gaseous nitrogen, water nozzle, plastic trays, scouring pads, and a controlled shop environment. Test subjects were classified into three groups: technical professionals having an appreciation for oxygen hazards; professional precision cleaners; and a group with no previous professional knowledge of oxygen or precision cleaning. Three test subjects were in each group, and each was provided with standard cleaning equipment, a cleaning procedure, and one of each of the three test items to clean. The results indicated that the achievable cleanliness level was independent of the technical knowledge or proficiency of the personnel cleaning the items. Results also showed that achieving a Level 300 particle count was more difficult than achieving a Level A nonvolatile residue amount.

Demonstration of plasma start-up by Coaxial Helicity Injection

NASA Astrophysics Data System (ADS)

Raman, Roger

2003-10-01

Experimental results on the first successful transfer of a Coaxial-Helicity-Injection- (CHI)-produced discharge to inductive operation are reported. CHI assisted plasma start-up is more robust than inductive-only operation and reduces volt-seconds consumption. After hand-off for inductive operation, the initial 100 kA of CHI-produced current drops to 44 kA, then ramps up to 180 kA, using only 30 mVs, more than 30induction alone. Coupling a CHI-produced discharge to induction from a pre-charged central solenoid has produced record plasma currents of 265kA in HIT-II. CHI discharges can also be generated while the central transformer is in the process of being pre-charged, during which period it induces a negative loop voltage on the CHI discharge. Such capability is believed to be important for a short pulse burning plasma experiment that could contain a solenoid. In the latest results, which improve upon the earlier work (Raman et. al., Phys. Rev. Lett., 90, (2003) 075005-1), no transient coil currents are necessary for the CHI produced closed flux generation. This is particularly important for a reactor in which the poloidal field coils would be located outside blanket structures. Three important results are reported. First, CHI is shown to produce closed flux plasma. Second, it is shown that electrode-based CHI plasmas can be sufficiently clean for fusion research purposes. Finally, it is shown that CHI discharges, in addition to generating useful startup current, improve the performance of inductive discharges. This work was motivated by earlier experiments on HIT-II and NSTX that showed coupling of the inductive drive to the external CHI power supply circuit, instead of to the main plasma discharge. These important results were obtained on the HIT-II spherical torus experiment (R/a of 0.3/0.2m, elongation of 1.5).

EXPLORING ENGINEERING CONTROL THROUGH PROCESS MANIPULATION OF RADIOACTIVE LIQUID WASTE TANK CHEMICAL CLEANING

DOE Office of Scientific and Technical Information (OSTI.GOV)

Brown, A.

2014-04-27

One method of remediating legacy liquid radioactive waste produced during the cold war, is aggressive in-tank chemical cleaning. Chemical cleaning has successfully reduced the curie content of residual waste heels in large underground storage tanks; however this process generates significant chemical hazards. Mercury is often the bounding hazard due to its extensive use in the separations process that produced the waste. This paper explores how variations in controllable process factors, tank level and temperature, may be manipulated to reduce the hazard potential related to mercury vapor generation. When compared using a multivariate regression analysis, findings indicated that there was amore » significant relationship between both tank level (p value of 1.65x10{sup -23}) and temperature (p value of 6.39x10{sup -6}) to the mercury vapor concentration in the tank ventilation system. Tank temperature showed the most promise as a controllable parameter for future tank cleaning endeavors. Despite statistically significant relationships, there may not be confidence in the ability to control accident scenarios to below mercury’s IDLH or PAC-III levels for future cleaning initiatives.« less

40 CFR 463.21 - Specialized definitions.

Code of Federal Regulations, 2014 CFR

2014-07-01

... AND STANDARDS (CONTINUED) PLASTICS MOLDING AND FORMING POINT SOURCE CATEGORY Cleaning Water... “average process water usage flow rate” for a plant with more than one plastics molding and forming process... a cleaning process and comes in contact with the plastic product over a period of one year. ...

40 CFR 463.21 - Specialized definitions.

Code of Federal Regulations, 2012 CFR

2012-07-01

... AND STANDARDS (CONTINUED) PLASTICS MOLDING AND FORMING POINT SOURCE CATEGORY Cleaning Water... “average process water usage flow rate” for a plant with more than one plastics molding and forming process... a cleaning process and comes in contact with the plastic product over a period of one year. ...

40 CFR 463.20 - Applicability; description of the cleaning water subcategory.

Code of Federal Regulations, 2011 CFR

2011-07-01

... the cleaning water subcategory are processes where water comes in contact with the plastic product for the purpose of cleaning the surface of the product and where water comes in contact with shaping...

Chemical cleaning re-invented: clean, lean and green.

PubMed

Hanson, Margaret; Vangeel, Michel

2014-01-01

A project undertaken in the Central Cleaning Department of Janssen, a Johnson and Johnson pharmaceutical company, demonstrates how ergonomics, environmental and industrial hygiene risks and quality concerns can be tackled simultaneously. The way equipment was cleaned was re-designed by an in-house cross-functional team to ensure a 'clean, lean and green' process. Initiatives included a new layout of the area, and new work processes and equipment to facilitate cleaning and handling items. This resulted in significant improvements: all ergonomics high risk tasks were reduced to moderate or low risk; hearing protection was no longer required; respirator requirement reduced by 67%; solvent use reduced by 73%; productivity improved, with 55% fewer operator hours required; and quality improved 40-fold. The return on investment was estimated at 3.125 years based on an investment of over €1.5 million (2008 prices). This win-win intervention allowed ergonomics, environmental, industrial hygiene, productivity and quality concerns all to be addressed.

Use of a novel cation-exchange restricted-access material for automated sample clean-up prior to the determination of basic drugs in plasma by liquid chromatography.

PubMed

Chiap, P; Rbeida, O; Christiaens, B; Hubert, Ph; Lubda, D; Boos, K S; Crommen, J

2002-10-25

A new kind of silica-based restricted-access material (RAM) has been tested in pre-columns for the on-line solid-phase extraction (SPE) of basic drugs from directly injected plasma samples before their quantitative analysis by reversed-phase liquid chromatography (LC), using the column switching technique. The outer surface of the porous RAM particlescontains hydrophilic diol groups while sulphonic acid groups are bound to the internal surface, which gives the sorbent the properties of a strong cation exchanger towards low molecular mass compounds. Macromolecules such as proteins have no access to the internal surface of the pre-column due to their exclusion from the pores and are then flushed directly out. The retention capability of this novel packing material has been tested for some hydrophilic basic drugs, such as atropine, fenoterol, ipratropium, procaine, sotalol and terbutaline, used as model compounds. The influence of the composition of the washing liquid on the retention of the analytes in the pre-column has been investigated. The elution profiles of the different compounds and the plasma matrix as well as the time needed for the transfer of the analytes from the pre-column to the analytical column were determined in order to deduce the most suitable conditions for the clean-up step and develop on-line methods for the LC determination of these compounds in plasma. The cationic exchange sorbent was also compared to another RAM, namely RP-18 ADS (alkyl diol silica) sorbent with respect to retention capability towards basic analytes.

Techniques for improving material fidelity and contrast consistency in secondary electron mode helium ion microscope (HIM) imaging

NASA Astrophysics Data System (ADS)

Thompson, William; Stern, Lewis; Ferranti, Dave; Huynh, Chuong; Scipioni, Larry; Notte, John; Sanford, Colin

2010-06-01

Recent helium ion microscope (HIM) imaging studies have shown the strong sensitivity of HIM induced secondary electron (SE) yields [1] to the sample physical and chemical properties and to its surface topography. This SE yield sensitivity is due to the low recoil energy of the HIM initiated electrons and their resulting short mean free path. Additionally, a material's SE escape probability is modulated by changes in the material's work function and surface potential. Due to the escape electrons' roughly 2eV mean energy and their nanometer range mean free path, HIM SE mode image contrast has significant material and surface sensitivity. The latest generation of HIM has a 0.35 nanometer resolution specification and is equipped with a plasma cleaning process to mitigate the effects of hydrocarbon contamination. However, for surfaces that may have native oxide chemistries influencing the secondary electron yield, a new process of low energy, shallow angle argon sputtering, was evaluated. The intent of this work was to study the effect of removing pre-existing native oxides and any in-situ deposited surface contaminants. We will introduce the sputter yield predictions of two established computer models and the sputter yield and sample modification forecasts of the molecular dynamics program, Kalypso. We will review the experimental technique applied to copper samples and show the copper grain contrast improvement that resulted when argon cleaned samples were imaged in HIM SE mode.

Cleaning and other control and validation strategies to prevent allergen cross-contact in food-processing operations.

PubMed

Jackson, Lauren S; Al-Taher, Fadwa M; Moorman, Mark; DeVries, Jonathan W; Tippett, Roger; Swanson, Katherine M J; Fu, Tong-Jen; Salter, Robert; Dunaif, George; Estes, Susan; Albillos, Silvia; Gendel, Steven M

2008-02-01

Food allergies affect an estimated 10 to 12 million people in the United States. Some of these individuals can develop life-threatening allergic reactions when exposed to allergenic proteins. At present, the only successful method to manage food allergies is to avoid foods containing allergens. Consumers with food allergies rely on food labels to disclose the presence of allergenic ingredients. However, undeclared allergens can be inadvertently introduced into a food via cross-contact during manufacturing. Although allergen removal through cleaning of shared equipment or processing lines has been identified as one of the critical points for effective allergen control, there is little published information on the effectiveness of cleaning procedures for removing allergenic materials from processing equipment. There also is no consensus on how to validate or verify the efficacy of cleaning procedures. The objectives of this review were (i) to study the incidence and cause of allergen cross-contact, (ii) to assess the science upon which the cleaning of food contact surfaces is based, (iii) to identify best practices for cleaning allergenic foods from food contact surfaces in wet and dry manufacturing environments, and (iv) to present best practices for validating and verifying the efficacy of allergen cleaning protocols.

Chapter 8: Plasma operation and control

NASA Astrophysics Data System (ADS)

ITER Physics Expert Group on Disruptions, Control, Plasma, and MHD; ITER Physics Expert Group on Energetic Particles, Heating, Current and Drive; ITER Physics Expert Group on Diagnostics; ITER Physics Basis Editors

1999-12-01

Wall conditioning of fusion devices involves removal of desorbable hydrogen isotopes and impurities from interior device surfaces to permit reliable plasma operation. Techniques used in present devices include baking, metal film gettering, deposition of thin films of low-Z material, pulse discharge cleaning, glow discharge cleaning, radio frequency discharge cleaning, and in situ limiter and divertor pumping. Although wall conditioning techniques have become increasingly sophisticated, a reactor scale facility will involve significant new challenges, including the development of techniques applicable in the presence of a magnetic field and of methods for efficient removal of tritium incorporated into co-deposited layers on plasma facing components and their support structures. The current status of various approaches is reviewed, and the implications for reactor scale devices are summarized. Creation and magnetic control of shaped and vertically unstable elongated plasmas have been mastered in many present tokamaks. The physics of equilibrium control for reactor scale plasmas will rely on the same principles, but will face additional challenges, exemplified by the ITER/FDR design. The absolute positioning of outermost flux surface and divertor strike points will have to be precise and reliable in view of the high heat fluxes at the separatrix. Long pulses will require minimal control actions, to reduce accumulation of AC losses in superconducting PF and TF coils. To this end, more complex feedback controllers are envisaged, and the experimental validation of the plasma equilibrium response models on which such controllers are designed is encouraging. Present simulation codes provide an adequate platform on which equilibrium response techniques can be validated. Burning plasmas require kinetic control in addition to traditional magnetic shape and position control. Kinetic control refers to measures controlling density, rotation and temperature in the plasma core as well as in plasma periphery and divertor. The planned diagnostics (Chapter 7) serve as sensors for kinetic control, while gas and pellet fuelling, auxiliary power and angular momentum input, impurity injection, and non-inductive current drive constitute the control actuators. For example, in an ignited plasma, core density controls fusion power output. Kinetic control algorithms vary according to the plasma state, e.g. H- or L-mode. Generally, present facilities have demonstrated the kinetic control methods required for a reactor scale device. Plasma initiation - breakdown, burnthrough and initial current ramp - in reactor scale tokamaks will not involve physics differing from that found in present day devices. For ITER, the induced electric field in the chamber will be ~0.3V· m-1 - comparable to that required by breakdown theory but somewhat smaller than in present devices. Thus, a start-up 3MW electron cyclotron heating system will be employed to assure burnthrough. Simulations show that plasma current ramp up and termination in a reactor scale device can follow procedures developed to avoid disruption in present devices. In particular, simulations remain in the stable area of the li-q plane. For design purposes, the resistive V·s consumed during initiation is found, by experiments, to follow the Ejima expression, 0.45μ0 RIp. Advanced tokamak control has two distinct goals. First, control of density, auxiliary power, and inductive current ramping to attain reverse shear q profiles and internal transport barriers, which persist until dissipated by magnetic flux diffusion. Such internal transport barriers can lead to transient ignition. Second, combined use poloidal field shape control with non-inductive current drive and NBI angular momentum injection to create and control steady state, high bootstrap fraction, reverse shear discharges. Active n = 1 magnetic feedback and/or driven rotation will be required to suppress resistive wall modes for steady state plasmas that must operate in the wall stabilized regime for reactor levels of β >= 0.03.

Development of clean coal and clean soil technologies using advanced agglomeration techniques

DOE Office of Scientific and Technical Information (OSTI.GOV)

Ignasiak, B.; Ignasiak, T.; Szymocha, K.

1990-01-01

Three major topics are discussed in this report: (1) Upgrading of Low Rank Coals by the Agflotherm Process. Test data, procedures, equipment, etc., are described for co-upgrading of subbituminous coals and heavy oil; (2) Upgrading of Bituminous Coals by the Agflotherm Process. Experimental procedures and data, bench and pilot scale equipments, etc., for beneficiating bituminous coals are described; (3) Soil Clean-up and Hydrocarbon Waste Treatment Process. Batch and pilot plant tests are described for soil contaminated by tar refuse from manufactured gas plant sites. (VC)

Tug fleet and ground operations schedules and controls. Volume 3: Program cost estimates

NASA Technical Reports Server (NTRS)

1975-01-01

Cost data for the tug DDT&E and operations phases are presented. Option 6 is the recommended option selected from seven options considered and was used as the basis for ground processing estimates. Option 6 provides for processing the tug in a factory clean environment in the low bay area of VAB with subsequent cleaning to visibly clean. The basis and results of the trade study to select Option 6 processing plan is included. Cost estimating methodology, a work breakdown structure, and a dictionary of WBS definitions is also provided.

Integrated gasification and plasma cleaning for waste treatment: A life cycle perspective

DOE Office of Scientific and Technical Information (OSTI.GOV)

Evangelisti, Sara; Tagliaferri, Carla; Advanced Plasma Power

2015-09-15

Highlights: • A life cycle assessment of an advanced two-stage process is undertaken. • A comparison of the impacts of the process when fed with 7 feedstock is presented. • Sensitivity analysis on the system is performed. • The treatment of RDF shows the lowest impact in terms of both GWP and AP. • The plasma shows a small contribution to the overall impact of the plant. - Abstract: In the past, almost all residual municipal waste in the UK was landfilled without treatment. Recent European waste management directives have promoted the uptake of more sustainable treatment technologies, especially formore » biodegradable waste. Local authorities have started considering other options for dealing with residual waste. In this study, a life cycle assessment of a future 20 MWe plant using an advanced two-stage gasification and plasma technology is undertaken. This plant can thermally treat waste feedstocks with different composition and heating value to produce electricity, steam and a vitrified product. The objective of the study is to analyse the environmental impacts of the process when fed with seven different feedstocks (including municipal solid waste, solid refuse fuel, reuse-derived fuel, wood biomass and commercial & industrial waste) and identify the process steps which contribute more to the environmental burden. A scenario analysis on key processes, such as oxygen production technology, metal recovery and the appropriate choice for the secondary market aggregate material, is performed. The influence of accounting for the biogenic carbon content in the waste from the calculations of the global warming potential is also shown. Results show that the treatment of the refuse-derived fuel has the lowest impact in terms of both global warming potential and acidification potential because of its high heating value. For all the other impact categories analysed, the two-stage gasification and plasma process shows a negative impact for all the waste streams considered, mainly due to the avoided burdens associated with the production of electricity from the plant. The plasma convertor, key characteristic of the thermal process investigated, although utilising electricity shows a relatively small contribution to the overall environmental impact of the plant. The results do not significantly vary in the scenario analysis. Accounting for biogenic carbon enhanced the performance of biomass and refuse-derived fuel in terms of global warming potential. The main analysis of this study has been performed from a waste management perspective, using 1 ton of waste as functional unit. A comparison of the results when 1 kWhe of electricity produced is used as functional unit shows similar trends for the environmental impact categories considered.« less

PNNL Delivers Expertise, Technology to Biofuels Start-up, InEnTec

ScienceCinema

Surma, Jeff

2017-12-09

Initially through its Entrepreneurial Leave of Absence Program, PNNL gives biofuels innovators a start in opening up a new business based on technology developed for incinerating waste on the Hanford Site. Today, the companies Plasma Enhanced Melters are in operation around the world converting organic waste into valuable, clean fuels.

LC-MS/MS determination of tranexamic acid in human plasma after phospholipid clean-up.

PubMed

Fabresse, Nicolas; Fall, Fanta; Etting, Isabelle; Devillier, Philippe; Alvarez, Jean-Claude; Grassin-Delyle, Stanislas

2017-07-15

Tranexamic acid is a widely used antifibrinolytic drug but its pharmacology and pharmacokinetics remains poorly understood. Owing to the recent knowledge on phospholipid-induced matrix effects during human plasma analysis, our aim was to develop a liquid chromatography-mass spectrometry method for the quantitation of tranexamic acid after efficient sample clean-up. Sample preparation consisted in phospholipid removal and protein precipitation. Hydrophilic interaction liquid chromatography was used and the detection was achieved with multiple reaction monitoring. The method was validated according to the European Medicine Agency guideline in the range 1.0-1000.0μg/mL. The performance of the method was excellent with a precision in the range 1.2-3.0%, an accuracy between 88.4 and 96.6% and a coefficient of variation of the internal standard-normalized matrix factor below 6.7%. This method is suitable for the quantification of tranexamic acid in the wide range of concentrations observed during clinical studies, with all the advantages related to phospholipid removal. Copyright © 2017 Elsevier B.V. All rights reserved.

Fluid bed gasification – Plasma converter process generating energy from solid waste: Experimental assessment of sulphur species

DOE Office of Scientific and Technical Information (OSTI.GOV)

Morrin, Shane, E-mail: shane.morrin@ucl.ac.uk; Advanced Plasma Power, Swindon, Wiltshire SN3 4DE; Lettieri, Paola, E-mail: p.lettieri@ucl.ac.uk

2014-01-15

Highlights: • We investigate gaseous sulphur species whilst gasifying sulphur-enriched wood pellets. • Experiments performed using a two stage fluid bed gasifier – plasma converter process. • Notable SO{sub 2} and relatively low COS levels were identified. • Oxygen-rich regions of the bed are believed to facilitate SO{sub 2}, with a delayed release. • Gas phase reducing regions above the bed would facilitate more prompt COS generation. - Abstract: Often perceived as a Cinderella material, there is growing appreciation for solid waste as a renewable content thermal process feed. Nonetheless, research on solid waste gasification and sulphur mechanisms in particularmore » is lacking. This paper presents results from two related experiments on a novel two stage gasification process, at demonstration scale, using a sulphur-enriched wood pellet feed. Notable SO{sub 2} and relatively low COS levels (before gas cleaning) were interesting features of the trials, and not normally expected under reducing gasification conditions. Analysis suggests that localised oxygen rich regions within the fluid bed played a role in SO{sub 2}’s generation. The response of COS to sulphur in the feed was quite prompt, whereas SO{sub 2} was more delayed. It is proposed that the bed material sequestered sulphur from the feed, later aiding SO{sub 2} generation. The more reducing gas phase regions above the bed would have facilitated COS – hence its faster response. These results provide a useful insight, with further analysis on a suite of performed experiments underway, along with thermodynamic modelling.« less

Comparative Study of Surface Chemical Composition and Oxide Layer Modification upon Oxygen Plasma Cleaning and Piranha Etching on a Novel Low Elastic Modulus Ti25Nb21Hf Alloy

NASA Astrophysics Data System (ADS)

Paredes, Virginia; Salvagni, Emiliano; Rodríguez-Castellón, Enrique; Manero, José María

2017-08-01

Metals are widely employed for many biological artificial replacements, and it is known that the quality and the physical/chemical properties of the surface are crucial for the success of the implant. Therefore, control over surface implant materials and their elastic moduli may be crucial to avoid undesired effects. In this study, surface modification upon cleaning and activation of a low elastic modulus Ti alloy (Ti25Hf21Nb) was investigated. Two different methods, oxygen plasma (OP) cleaning and piranha (PI) solution, were studied and compared. Both surface treatments were effective for organic contaminant removal and to increase the Ti-oxide layer thickness rather than other metal-oxides present at the surface, which is beneficial for biocompatibility of the material. Furthermore, both techniques drastically increased hydrophilicity and introduced oxidation and hydroxylation (OH)-functional groups at the surface that may be beneficial for further chemical modifications. However, these treatments did not alter the surface roughness and bulk material properties. The surfaces were fully characterized in terms of surface roughness, wettability, oxide layer composition, and hydroxyl surface density through analytical techniques (interferometry, X-ray photoelectron spectroscopy (XPS), contact angle, and zinc complexation). These findings provide essential information when planning surface modifications for cleanliness, oxide layer thickness, and surface hydroxyl density, as control over these factors is essential for many applications, especially in biomaterials.

Innovative technologies on fuel assemblies cleaning for sodium fast reactors: First considerations on cleaning process

DOE Office of Scientific and Technical Information (OSTI.GOV)

Simon, N.; Lorcet, H.; Beauchamp, F.

2012-07-01

Within the framework of Sodium Fast Reactor development, innovative fuel assembly cleaning operations are investigated to meet the GEN IV goals of safety and of process development. One of the challenges is to mitigate the Sodium Water Reaction currently used in these processes. The potential applications of aqueous solutions of mineral salts (including the possibility of using redox chemical reactions) to mitigate the Sodium Water Reaction are considered in a first part and a new experimental bench, dedicated to this study, is described. Anhydrous alternative options based on Na/CO{sub 2} interaction are also presented. Then, in a second part, amore » functional study conducted on the cleaning pit is proposed. Based on experimental feedback, some calculations are carried out to estimate the sodium inventory on the fuel elements, and physical methods like hot inert gas sweeping to reduce this inventory are also presented. Finally, the implementation of these innovative solutions in cleaning pits is studied in regard to the expected performances. (authors)« less

Sceening, down selection, and implementation of environmentally compliant cleaning and insulation bonding for MNASA

NASA Astrophysics Data System (ADS)

Keen, Jill M.; Hutchens, D. E.; Smith, G. M.; Dillard, T. W.

1994-06-01

MNASA, a quarter-scale space shuttle solid rocket motor, has historically been processed using environmentally and physiologically harmful chemicals. This program draws from previous testing done in support of full-scale manufacturing and examines the synergy and interdependency between environmentally acceptable materials for Solid Rocket Motor insulation applications, bonding, corrosion inhibiting, painting, priming and cleaning; and then implements new materials and processes in sub-scale motors. Tests have been conducted to eliminate or minimize hazardous chemicals used in the manufacture of MNASA components and identify alternate materials and/or processes following NASA Operational Environment Team (NOET) priorities. This presentation describes implementation of high pressure water refurbishment cleaning, aqueous precision cleaning using both Brulin 815 GD and Jettacin and insulation case bonding using ODC compliant primers and adhesives.

[Effect of manual cleaning and machine cleaning for dental handpiece].

PubMed

Zhou, Xiaoli; Huang, Hao; He, Xiaoyan; Chen, Hui; Zhou, Xiaoying

2013-08-01

Comparing the dental handpiece' s cleaning effect between manual cleaning and machine cleaning. Eighty same contaminated dental handpieces were randomly divided into experimental group and control group, each group contains 40 pieces. The experimental group was treated by full automatic washing machine, and the control group was cleaned manually. The cleaning method was conducted according to the operations process standard, then ATP bioluminescence was used to test the cleaning results. Average relative light units (RLU) by ATP bioluminescence detection were as follows: Experimental group was 9, control group was 41. The two groups were less than the recommended RLU value provided by the instrument manufacturer (RLU < or = 45). There was significant difference between the two groups (P < 0.05). The cleaning quality of the experimental group was better than that of control group. It is recommended that the central sterile supply department should clean dental handpieces by machine to ensure the cleaning effect and maintain the quality.

Precision Cleaning - Path to Premier

NASA Technical Reports Server (NTRS)

Mackler, Scott E.

2008-01-01

ITT Space Systems Division s new Precision Cleaning facility provides critical cleaning and packaging of aerospace flight hardware and optical payloads to meet customer performance requirements. The Precision Cleaning Path to Premier Project was a 2007 capital project and is a key element in the approved Premier Resource Management - Integrated Supply Chain Footprint Optimization Project. Formerly precision cleaning was located offsite in a leased building. A new facility equipped with modern precision cleaning equipment including advanced process analytical technology and improved capabilities was designed and built after outsourcing solutions were investigated and found lacking in ability to meet quality specifications and schedule needs. SSD cleans parts that can range in size from a single threaded fastener all the way up to large composite structures. Materials that can be processed include optics, composites, metals and various high performance coatings. We are required to provide verification to our customers that we have met their particulate and molecular cleanliness requirements and we have that analytical capability in this new facility. The new facility footprint is approximately half the size of the former leased operation and provides double the amount of throughput. Process improvements and new cleaning equipment are projected to increase 1st pass yield from 78% to 98% avoiding $300K+/yr in rework costs. Cost avoidance of $350K/yr will result from elimination of rent, IT services, transportation, and decreased utility costs. Savings due to reduced staff expected to net $4-500K/yr.

SURVEY OF AIR AND GAS CLEANING OPERATIONS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Morgenthaler, A.C.

1959-09-01

An informative summary of air and gas cleaning operations in the Chemicai Processing Department of the Hanfor Atomic Products Operation, Richland, Washington, is presented. Descriptlons of the fundamental components of cleaning systems, their applications, and cost information are included. (R.G.G.)

CLEANING OF FLUE GASES FROM WASTE COMBUSTORS

EPA Science Inventory

The paper addresses flue gas cleaning processes currently used commercially in waste combustion facilities. It also discusses the operating concepts of dry, semi-dry, and wet processes and their effectiveness in controlling various pollutants. Air pollutants from the combustion o...

ENVIRONMENTALLY FRIENDLIER ALTERNATIVES TO ORGANIC SYNTHESES

EPA Science Inventory

An overview of the research activity at the USEPA AWBERC Research Center in general and the Sustainable Technology Division with specific reference to clean process development will be presented. Several examples of clean and efficient chemical processes will be highlighted that ...

Production of geopolymers using glass produced from DC plasma treatment of air pollution control (APC) residues.

PubMed

Kourti, Ioanna; Rani, D Amutha; Deegan, D; Boccaccini, A R; Cheeseman, C R

2010-04-15

Air pollution control (APC) residues are the hazardous waste produced from cleaning gaseous emissions at energy-from-waste (EfW) facilities processing municipal solid waste (MSW). APC residues have been blended with glass-forming additives and treated using DC plasma technology to produce a high calcium alumino-silicate glass. This research has investigated the optimisation and properties of geopolymers prepared from this glass. Work has shown that high strength geopolymers can be formed and that the NaOH concentration of the activating solution significantly affects the properties. The broad particle size distribution of the APC residue glass used in these experiments results in a microstructure that contains unreacted glass particles included within a geopolymer binder phase. The high calcium content of APC residues may cause the formation of some amorphous calcium silicate hydrate (C-S-H) gel. A mix prepared with S/L=3.4, Si/Al=2.6 and [NaOH]=6M in the activating solution, produced high strength geopolymers with compressive strengths of approximately 130 MPa. This material had high density (2070 kg/m(3)) and low porosity. The research demonstrates for the first time that glass derived from DC plasma treatment of APC residues can be used to form high strength geopolymer-glass composites that have potential for use in a range of applications. 2009 Elsevier B.V. All rights reserved.

Assessment of disinfection of hospital surfaces using different monitoring methods1

PubMed Central

Ferreira, Adriano Menis; de Andrade, Denise; Rigotti, Marcelo Alessandro; de Almeida, Margarete Teresa Gottardo; Guerra, Odanir Garcia; dos Santos, Aires Garcia

2015-01-01

OBJECTIVE: to assess the efficiency of cleaning/disinfection of surfaces of an Intensive Care Unit. METHOD: descriptive-exploratory study with quantitative approach conducted over the course of four weeks. Visual inspection, bioluminescence adenosine triphosphate and microbiological indicators were used to indicate cleanliness/disinfection. Five surfaces (bed rails, bedside tables, infusion pumps, nurses' counter, and medical prescription table) were assessed before and after the use of rubbing alcohol at 70% (w/v), totaling 160 samples for each method. Non-parametric tests were used considering statistically significant differences at p<0.05. RESULTS: after the cleaning/disinfection process, 87.5, 79.4 and 87.5% of the surfaces were considered clean using the visual inspection, bioluminescence adenosine triphosphate and microbiological analyses, respectively. A statistically significant decrease was observed in the disapproval rates after the cleaning process considering the three assessment methods; the visual inspection was the least reliable. CONCLUSION: the cleaning/disinfection method was efficient in reducing microbial load and organic matter of surfaces, however, these findings require further study to clarify aspects related to the efficiency of friction, its frequency, and whether or not there is association with other inputs to achieve improved results of the cleaning/disinfection process. PMID:26312634

Assessment of disinfection of hospital surfaces using different monitoring methods.

PubMed

Ferreira, Adriano Menis; de Andrade, Denise; Rigotti, Marcelo Alessandro; de Almeida, Margarete Teresa Gottardo; Guerra, Odanir Garcia; dos Santos Junior, Aires Garcia

2015-01-01

to assess the efficiency of cleaning/disinfection of surfaces of an Intensive Care Unit. descriptive-exploratory study with quantitative approach conducted over the course of four weeks. Visual inspection, bioluminescence adenosine triphosphate and microbiological indicators were used to indicate cleanliness/disinfection. Five surfaces (bed rails, bedside tables, infusion pumps, nurses' counter, and medical prescription table) were assessed before and after the use of rubbing alcohol at 70% (w/v), totaling 160 samples for each method. Non-parametric tests were used considering statistically significant differences at p<0.05. after the cleaning/disinfection process, 87.5, 79.4 and 87.5% of the surfaces were considered clean using the visual inspection, bioluminescence adenosine triphosphate and microbiological analyses, respectively. A statistically significant decrease was observed in the disapproval rates after the cleaning process considering the three assessment methods; the visual inspection was the least reliable. the cleaning/disinfection method was efficient in reducing microbial load and organic matter of surfaces, however, these findings require further study to clarify aspects related to the efficiency of friction, its frequency, and whether or not there is association with other inputs to achieve improved results of the cleaning/disinfection process.

Fusion energy science: Clean, safe, and abundant energy through innovative science and technology

DOE Office of Scientific and Technical Information (OSTI.GOV)

None

Fusion energy science combines the study of the behavior of plasmas--the state of matter that forms 99% of the visible universe--with a vision of using fusion--the energy source of the stars--to create an affordable, plentiful, and environmentally benign energy source for humankind. The dual nature of fusion energy science provides an unfolding panorama of exciting intellectual challenge and a promise of an attractive energy source for generations to come. The goal of this report is a comprehensive understanding of plasma behavior leading to an affordable and attractive fusion energy source.

Effect of plasma pretreatment on adhesion and mechanical properties of UV-curable coatings on plastics

NASA Astrophysics Data System (ADS)

Gururaj, T.; Subasri, R.; Raju, K. R. C. Soma; Padmanabham, G.

2011-02-01

An attempt was made to study the effect of plasma surface activation on the adhesion of UV-curable sol-gel coatings on polycarbonate (PC) and polymethylmethacrylate (PMMA) substrates. The sol was synthesized by the hydrolysis and condensation of a UV-curable silane in combination with Zr-n-propoxide. Coatings deposited by dip coating were cured using UV-radiation followed by thermal curing between 80 °C and 130 °C. The effect of plasma surface treatment on the wettability of the polymer surface prior to coating deposition was followed up by measuring the water contact angle. The water contact angle on the surface of as-cleaned substrates was 80° ± 2° and that after plasma treatment was 43° ± 1° and 50° ± 2° for PC and PMMA respectively. Adhesion as well as mechanical properties like scratch resistance and taber abrasion resistance were evaluated for coatings deposited over plasma treated and untreated surfaces.

Experiment and simulation of novel liquid crystal plasma mirrors for high contrast, intense laser pulses

PubMed Central

Poole, P. L.; Krygier, A.; Cochran, G. E.; Foster, P. S.; Scott, G. G.; Wilson, L. A.; Bailey, J.; Bourgeois, N.; Hernandez-Gomez, C.; Neely, D.; Rajeev, P. P.; Freeman, R. R.; Schumacher, D. W.

2016-01-01

We describe the first demonstration of plasma mirrors made using freely suspended, ultra-thin films formed dynamically and in-situ. We also present novel particle-in-cell simulations that for the first time incorporate multiphoton ionization and dielectric models that are necessary for describing plasma mirrors. Dielectric plasma mirrors are a crucial component for high intensity laser applications such as ion acceleration and solid target high harmonic generation because they greatly improve pulse contrast. We use the liquid crystal 8CB and introduce an innovative dynamic film formation device that can tune the film thickness so that it acts as its own antireflection coating. Films can be formed at a prolonged, high repetition rate without the need for subsequent realignment. High intensity reflectance above 75% and low-field reflectance below 0.2% are demonstrated, as well as initial ion acceleration experimental results that demonstrate increased ion energy and yield on shots cleaned with these plasma mirrors. PMID:27557592

Experiment and simulation of novel liquid crystal plasma mirrors for high contrast, intense laser pulses

DOE PAGES

Poole, P. L.; Krygier, A.; Cochran, G. E.; ...

2016-08-25

Here, we describe the first demonstration of plasma mirrors made using freely suspended, ultra-thin films formed dynamically and in-situ. We also present novel particle-in-cell simulations that for the first time incorporate multiphoton ionization and dielectric models that are necessary for describing plasma mirrors. Dielectric plasma mirrors are a crucial component for high intensity laser applications such as ion acceleration and solid target high harmonic generation because they greatly improve pulse contrast. We use the liquid crystal 8CB and introduce an innovative dynamic film formation device that can tune the film thickness so that it acts as its own antireflection coating.more » Films can be formed at a prolonged, high repetition rate without the need for subsequent realignment. High intensity reflectance above 75% and low-field reflectance below 0.2% are demonstrated, as well as initial ion acceleration experimental results that demonstrate increased ion energy and yield on shots cleaned with these plasma mirrors.« less

[Research on cleaning rate of the C-shaped canal treated by manual or rotary endodontic file combined with ultrasonic rinsing].

PubMed

Wang, Jing; Gao, Yan; Wang, Qing-shan; Zhang, Yan; Rong, Li; Wang, Jiu

2014-08-01

To evaluate the cleaning effect of the C-shaped canal treated by manual K file and ProTaper rotary endodontic file combined with ultrasonic cleaning, and find a better cleaning program for the C-shaped root canal. Fifty mandibular second molars were randomly divided into 5 groups: K file group, K file+ultrasonic rinsing group, ProTaper group, ProTaper+ultrasonic rinsing group and the control group. After initial shaping and cleaning, the mandibular second molars were soaked in formalin and stained. Under microscopy, the cleaning rate of necrotic tissue and cutting area were observed and analyzed. The data was processed with SPSS 17.0 software package. The cleaning rates of the treated groups were significantly higher than that of the control group (P<0.05); In each treatment group, the cleaning rate of the apex was significantly lower than that of the crown and central part (P<0.05); The cutting score of ProTaper+ultrasonic cleaning group was lower than that of the other treatment groups; The cutting score of the K file+ultrasonic rinsing group was significantly lower than that of the K file group (P<0.05); The cutting score and cleaning rate were negatively correlated (r=-0.712, P=0.000 ), the linear regression was the cleaning rate =98.325-4.325 × wall cutting score (R=0.454, P<0.05). In the process of shaping and cleaning of C-shaped canal, it is recommended that the ProTaper nickel-titanium rotary endodontic file should be chosen to clean the top of the taproot pipe and combined with ultrasonic rinsing to achieve better results.

Modification of the surface properties of glass-ceramic materials at low-pressure RF plasma stream

NASA Astrophysics Data System (ADS)

Tovstopyat, Alexander; Gafarov, Ildar; Galeev, Vadim; Azarova, Valentina; Golyaeva, Anastasia

2018-05-01

The surface roughness has a huge effect on the mechanical, optical, and electronic properties of materials. In modern optical systems, the specifications for the surface accuracy and smoothness of substrates are becoming even more stringent. Commercially available pre-polished glass-ceramic substrates were treated with the radio frequency (RF) inductively coupled (13.56 MHz) low-pressure plasma to clean the surface of the samples and decrease the roughness. Optical emission spectroscopy was used to investigate the plasma stream parameters and phase-shifted interferometry to investigate the surface of the specimen. In this work, the dependence of RF inductively coupled plasma on macroscopic parameters was investigated with the focus on improving the surfaces. The ion energy, sputtering rate, and homogeneity were investigated. The improvements of the glass-ceramic surfaces from 2.6 to 2.2 Å root mean square by removing the "waste" after the previous operations had been achieved.

Paraelectric gas flow accelerator

NASA Technical Reports Server (NTRS)

Sherman, Daniel M. (Inventor); Wilkinson, Stephen P. (Inventor); Roth, J. Reece (Inventor)

2001-01-01

A substrate is configured with first and second sets of electrodes, where the second set of electrodes is positioned asymmetrically between the first set of electrodes. When a RF voltage is applied to the electrodes sufficient to generate a discharge plasma (e.g., a one-atmosphere uniform glow discharge plasma) in the gas adjacent to the substrate, the asymmetry in the electrode configuration results in force being applied to the active species in the plasma and in turn to the neutral background gas. Depending on the relative orientation of the electrodes to the gas, the present invention can be used to accelerate or decelerate the gas. The present invention has many potential applications, including increasing or decreasing aerodynamic drag or turbulence, and controlling the flow of active and/or neutral species for such uses as flow separation, altering heat flow, plasma cleaning, sterilization, deposition, etching, or alteration in wettability, printability, and/or adhesion.

Can tokamaks PFC survive a single event of any plasma instabilities?

NASA Astrophysics Data System (ADS)

Hassanein, A.; Sizyuk, V.; Miloshevsky, G.; Sizyuk, T.

2013-07-01

Plasma instability events such as disruptions, edge-localized modes (ELMs), runaway electrons (REs), and vertical displacement events (VDEs) are continued to be serious events and most limiting factors for successful tokamak reactor concept. The plasma-facing components (PFCs), e.g., wall, divertor, and limited surfaces of a tokamak as well as coolant structure materials are subjected to intense particle and heat loads and must maintain a clean and stable surface environment among them and the core/edge plasma. Typical ITER transient events parameters are used for assessing the damage from these four different instability events. HEIGHTS simulation showed that a single event of a disruption, giant ELM, VDE, or RE can cause significant surface erosion (melting and vaporization) damage to PFC, nearby components, and/or structural materials (VDE, RE) melting and possible burnout of coolant tubes that could result in shut down of reactor for extended repair time.

Hazardous Waste: Cleanup and Prevention.

ERIC Educational Resources Information Center

Vandas, Steve; Cronin, Nancy L.

1996-01-01

Discusses hazardous waste, waste disposal, unsafe exposure, movement of hazardous waste, and the Superfund clean-up process that consists of site discovery, site assessment, clean-up method selection, site clean up, and site maintenance. Argues that proper disposal of hazardous waste is everybody's responsibility. (JRH)

Hybrid Sargassum-sand sorbent: a novel adsorbent in packed column to treat metal-bearing wastewaters from inductively coupled plasma-optical emission spectrometry.

PubMed

Vijayaraghavan, K; Joshi, U M

2013-01-01

Laboratory batch and column experiments were carried out to examine the efficiency of algal-based treatment technique to clean-up wastewaters emanating from inductively coupled plasma-optical emission spectrometry (ICP-OES). Chemical characterization revealed the extreme complexity of the wastewater, with the presence of 14 different metals under very low pH (pH = 1.1), high conductivity (6.98 mS/cm), total dissolved solid (4.46 g/L) and salinity (3.77). Batch experiments using Sargassum biomass indicated that it was possible to attain high removal efficiencies at optimum pH of 4.0. Efforts were also made to continuously treat ICP-OES wastewater using up-flow packed column. However, swelling of Sargassum biomass leads to stoppage of column. To address the problem, Sargassum was mixed with sand at a ratio of 40: 60 on volume basis. Remarkably, the hybrid Sargassum-sand sorbent showed very high removal efficiency towards multiple metal ions with the column able to operate for 11 h at a flow rate of 10 mL/min. Metal ions such as Cu, Cd, and Pb were only under trace levels in the treated water until 11 h. The results of the treatment process were compared with trade effluent discharge standards. Further the process evaluation and cost analysis were presented.

Superhydrophobic ceramic coating: Fabrication by solution precursor plasma spray and investigation of wetting behavior.

PubMed

Xu, Pengyun; Coyle, Thomas W; Pershin, Larry; Mostaghimi, Javad

2018-08-01

Superhydrophobic surfaces are often created by fabricating suitable surface structures from low-surface-energy organic materials using processes that are not suitable for large-scale fabrication. Rare earth oxides (REO) exhibit hydrophobic behavior that is unusual among oxides. Solution precursor plasma spray (SPPS) deposition is a rapid, one-step process that can produce ceramic coatings with fine scale columnar structures. Manipulation of the structure of REO coatings through variation in deposition conditions may allow the wetting behavior to be controlled. Yb 2 O 3 coatings were fabricated via SPPS. Coating structure was investigated by scanning electron microscopy, digital optical microscopy, and x-ray diffraction. The static water contact angle and roll-off angle were measured, and the dynamic impact of water droplets on the coating surface recorded. Superhydrophobic behavior was observed; the best coating exhibited a water contact angle of ∼163°, a roll-off angle of ∼6°, and complete droplet rebound behavior. All coatings were crystalline Yb 2 O 3 , with a nano-scale roughness superimposed on a micron-scale columnar structure. The wetting behaviors of coatings deposited at different standoff distances were correlated with the coating microstructures and surface topographies. The self-cleaning, water flushing and water jetting tests were conducted and further demonstrated the excellent and durable hydrophobicity of the coatings. Copyright © 2018 Elsevier Inc. All rights reserved.

Parallel Algorithm for GPU Processing; for use in High Speed Machine Vision Sensing of Cotton Lint Trash.

PubMed

Pelletier, Mathew G

2008-02-08

One of the main hurdles standing in the way of optimal cleaning of cotton lint isthe lack of sensing systems that can react fast enough to provide the control system withreal-time information as to the level of trash contamination of the cotton lint. This researchexamines the use of programmable graphic processing units (GPU) as an alternative to thePC's traditional use of the central processing unit (CPU). The use of the GPU, as analternative computation platform, allowed for the machine vision system to gain asignificant improvement in processing time. By improving the processing time, thisresearch seeks to address the lack of availability of rapid trash sensing systems and thusalleviate a situation in which the current systems view the cotton lint either well before, orafter, the cotton is cleaned. This extended lag/lead time that is currently imposed on thecotton trash cleaning control systems, is what is responsible for system operators utilizing avery large dead-band safety buffer in order to ensure that the cotton lint is not undercleaned.Unfortunately, the utilization of a large dead-band buffer results in the majority ofthe cotton lint being over-cleaned which in turn causes lint fiber-damage as well assignificant losses of the valuable lint due to the excessive use of cleaning machinery. Thisresearch estimates that upwards of a 30% reduction in lint loss could be gained through theuse of a tightly coupled trash sensor to the cleaning machinery control systems. Thisresearch seeks to improve processing times through the development of a new algorithm forcotton trash sensing that allows for implementation on a highly parallel architecture.Additionally, by moving the new parallel algorithm onto an alternative computing platform,the graphic processing unit "GPU", for processing of the cotton trash images, a speed up ofover 6.5 times, over optimized code running on the PC's central processing unit "CPU", wasgained. The new parallel algorithm operating on the GPU was able to process a 1024x1024image in less than 17ms. At this improved speed, the image processing system's performance should now be sufficient to provide a system that would be capable of realtimefeed-back control that is in tight cooperation with the cleaning equipment.

New electrostatic coal cleaning method cuts sulfur content by 40%

DOE Office of Scientific and Technical Information (OSTI.GOV)

Not Available

1985-12-01

An emission control system that electrically charges pollutants and coal particles promises to reduce sulfur 40% at half the cost. The dry coal cleaning processes offer superior performance and better economics than conventional flotation cleaning. Advanced Energy Dynamics, Inc. (AED) is developing both fine and ultra fine processes which increase combustion efficiency and boiler reliability and reduced operating costs. The article gives details from the performance tests and comparisons and summarizes the economic analyses. 4 tables.

The Role of Surface Chemistry in Adhesion and Wetting of Gecko Toe Pads

PubMed Central

Badge, Ila; Stark, Alyssa Y.; Paoloni, Eva L.; Niewiarowski, Peter H.; Dhinojwala, Ali

2014-01-01

An array of micron-sized setal hairs offers geckos a unique ability to walk on vertical surfaces using van der Waals interactions. Although many studies have focused on the role of surface morphology of the hairs, very little is known about the role of surface chemistry on wetting and adhesion. We expect that both surface chemistry and morphology are important, not only to achieve optimum dry adhesion but also for increased efficiency in self-cleaning of water and adhesion under wet conditions. Here, we used a plasma-based vapor deposition process to coat the hairy patterns on gecko toe pad sheds with polar and non-polar coatings without significantly perturbing the setal morphology. By a comparison of wetting across treatments, we show that the intrinsic surface of gecko setae has a water contact angle between 70–90°. As expected, under wet conditions, adhesion on a hydrophilic surface (glass) was lower than that on a hydrophobic surface (alkyl-silane monolayer on glass). Surprisingly under wet and dry conditions the adhesion was comparable on the hydrophobic surface, independent of the surface chemistry of the setal hairs. This work highlights the need to utilize morphology and surface chemistry in developing successful synthetic adhesives with desirable adhesion and self-cleaning properties. PMID:25323067

The Role of Surface Chemistry in Adhesion and Wetting of Gecko Toe Pads

NASA Astrophysics Data System (ADS)

Badge, Ila; Stark, Alyssa Y.; Paoloni, Eva L.; Niewiarowski, Peter H.; Dhinojwala, Ali

2014-10-01

An array of micron-sized setal hairs offers geckos a unique ability to walk on vertical surfaces using van der Waals interactions. Although many studies have focused on the role of surface morphology of the hairs, very little is known about the role of surface chemistry on wetting and adhesion. We expect that both surface chemistry and morphology are important, not only to achieve optimum dry adhesion but also for increased efficiency in self-cleaning of water and adhesion under wet conditions. Here, we used a plasma-based vapor deposition process to coat the hairy patterns on gecko toe pad sheds with polar and non-polar coatings without significantly perturbing the setal morphology. By a comparison of wetting across treatments, we show that the intrinsic surface of gecko setae has a water contact angle between 70-90°. As expected, under wet conditions, adhesion on a hydrophilic surface (glass) was lower than that on a hydrophobic surface (alkyl-silane monolayer on glass). Surprisingly under wet and dry conditions the adhesion was comparable on the hydrophobic surface, independent of the surface chemistry of the setal hairs. This work highlights the need to utilize morphology and surface chemistry in developing successful synthetic adhesives with desirable adhesion and self-cleaning properties.

NATO/CCMS PILOT STUDY ON CLEAN PRODUCTS & PROCESSES

EPA Science Inventory

Led by the United States, represented by the U.S. Environmental Protection Agency's (EPA's) National Risk Management Research Laboratory, the Pilot Study on Clean Products and Processes was instituted to create an international forum where current trends, developments, and expert...

Processes For Cleaning a Cathode Tube and Assemblies In A Hollow Cathode Assembly

NASA Technical Reports Server (NTRS)

Patterson, Michael J. (Inventor); Verhey, Timothy R. R. (Inventor); Soulas, George C. (Inventor)

2001-01-01

The present invention is a process for cleaning a cathode tube and other subassemblies in a hollow cathode assembly. In the disclosed process, hand covering elastomer gloves are used for handling all cathode assembly parts. The cathode tube and other subassemblies are cleaned with a lint-free cloth damped with acetone, then wiped with alcohol, immersed in ethyl alcohol or acetone, and ultrasonic agitation is applied, heating to 60 C. for ethyl alcohol or 56 C. for acetone. The cathode tube and other subassemblies are dried by blowing with nitrogen gas.

Results Of Automating A Photolithography Cell In A Clean Tunnel

NASA Astrophysics Data System (ADS)

June, David H.

1987-01-01

A prototype automated photobay was installed in an existing fab area utilizing flexible material handling techniques within a clean tunnel. The project objective was to prove design concepts of automated cassette-to-cassette handling within a clean tunnel that isolated operators from the wafers being processed. Material handling was by monorail track transport system to feed cassettes to pick and place robots. The robots loaded and unloaded cassettes of wafers to each of the various pieces of process equipment. The material handling algorithms, recipe downloading and statistical process control functions were all performed by custom software on the photobay cell controller.

Green Solvents for Precision Cleaning

NASA Technical Reports Server (NTRS)

Grandelli, Heather; Maloney, Phillip; DeVor, Robert; Surma, Jan; Hintze, Paul

2013-01-01

Aerospace machinery used in liquid oxygen (LOX) fuel systems must be precision cleaned to achieve a very low level of non-volatile residue (< 1 mg0.1 m2), especially flammable residue. Traditionally chlorofluorocarbons (CFCs) have been used in the precision cleaning of LOX systems, specifically CFC 113 (C2Cl3F3). CFCs have been known to cause the depletion of ozone and in 1987, were banned by the Montreal Protocol due to health, safety and environmental concerns. This has now led to the development of new processes in the precision cleaning of aerospace components. An ideal solvent-replacement is non-flammable, environmentally benign, non-corrosive, inexpensive, effective and evaporates completely, leaving no residue. Highlighted is a green precision cleaning process, which is contaminant removal using supercritical carbon dioxide as the environmentally benign solvent. In this process, the contaminant is dissolved in carbon dioxide, and the parts are recovered at the end of the cleaning process completely dry and ready for use. Typical contaminants of aerospace components include hydrocarbon greases, hydraulic fluids, silicone fluids and greases, fluorocarbon fluids and greases and fingerprint oil. Metallic aerospace components range from small nuts and bolts to much larger parts, such as butterfly valves 18 in diameter. A fluorinated grease, Krytox, is investigated as a model contaminant in these preliminary studies, and aluminum coupons are employed as a model aerospace component. Preliminary studies are presented in which the experimental parameters are optimized for removal of Krytox from aluminum coupons in a stirred-batch process. The experimental conditions investigated are temperature, pressure, exposure time and impeller speed. Temperatures of 308 - 423 K, pressures in the range of 8.3 - 41.4 MPa, exposure times between 5 - 60 min and impeller speeds of 0 - 1000 rpm were investigated. Preliminary results showed up to 86 cleaning efficiency with the moderate processing conditions of 323 K, 13.8 MPa, 30 min and 750 rpm.

Otolith Trace Element Chemistry of Juvenile Black Rockfish

NASA Astrophysics Data System (ADS)

Hardin, W.; Bobko, S. J.; Jones, C. M.

2002-12-01

In the summer of 1997 we collected young-of -the-year (YOY) black rockfish, Sebastes melanops, from floating docks and seagrass beds in Newport and Coos Bay, Oregon. Otoliths were extracted from randomly selected fish, sectioned and polished under general laboratory conditions, and cleaned in a class 100 clean room. We used Laser Ablation - Inductively Coupled Mass Spectrometry (LA-ICPMS) to analyze elemental composition of the estuarine phase of the otoliths. While we observed differences in Mn/Ca ratios between the two estuaries, there was no statistical difference in otolith trace element chemistry ratios between estuaries using MANOVA. To determine if laboratory processing of otoliths might have impeded us from detecting differences in otolith chemistry, we conducted a second experiment. Right and left otoliths from 10 additional Coos Bay fish were randomly allocated to two processing methods. The first method was identical to our initial otolith processing, sectioning and polishing under normal laboratory conditions. In the second method, polishing was done in the clean room. For both methods otoliths went through a final cleaning in the clean room and analyzed with LA-ICPMS. While we did not detect statistical differences in element ratios between the two methods, otoliths polished outside the clean room had much higher variances. This increased variance might have lowered our ability to detect differences in otolith chemistry between estuaries. Based on our results, we recommend polishing otoliths under clean room conditions to reduce contamination.

University Researchers Approach to Providing Computer Simulations to Industry.

NASA Astrophysics Data System (ADS)

Birdsall, Charles

1996-05-01

University researchers perform in an exploratory mode in developing and applying computer simulations to their research problems. Post-docs and students make codes suited to their problems, and to thesis and article writing, with little code use planned beyond such. Industry product developers want well tested, cleanly applicable simulation codes, with freedom to go to the code developers for bug fixing and improvements (and not to have to hunt for a student who has graduated). Hence, these different modes clash; some cushion of understanding and new elements are needed to effect broader, continuing use of university developed codes. We and others have evolved approaches that appear to work, including providing free software, but with follow-ups done by small companies. (See Ref. 1 for more.) We will present our development of plasma device codes over 15 years, evolving into free distribution on the Internet (Ref. 2) with short courses and workshops; follow-ups are done by a small company (of former students, the code writers). In addition, an example of university code development will be given, that of application of the series (or dipole) resonance to providing plasma surface wave generated plasmas, drawing on decades old research; potential applications will be given. We will present what other university groups are doing and reflections on these modes by modelers and designers in the plasma processing industry (semiconductor manufacturing equipment companies), which is highly empirical at present. All of this interaction is still evolving. 9 Brown J. Browning, Sci.Am. Jan 1996, p.35 www See Internet address http://ptsg.eecs.berkeley.edu thebibliography

Influence of oxygen in atmospheric-pressure argon plasma jet on sterilization of Bacillus atrophaeous spores

NASA Astrophysics Data System (ADS)

Lim, Jin-Pyo; Uhm, Han S.; Li, Shou-Zhe

2007-09-01

A nonequilibrium Ar /O2 plasma discharge at atmospheric pressure was carried out in a coaxial cylindrical reactor with a stepped electrode configuration powered by a 13.56MHz rf power supplier. The argon glow discharge with high electron density produces oxygen reactive species in large quantities. Argon plasma jets penetrate deep into ambient air and create a path for oxygen radicals to sterilize microbes. A sterilization experiment with bacterial endospores indicates that an argon-oxygen plasma jet very effectively kills endospores of Bacillus atrophaeus (ATCC 9372), thereby demonstrating its capability to clean surfaces and its usefulness for reinstating contaminated equipment as free from toxic biological warfare agents. The decimal reduction time (D values) of the Ar /O2 plasma jet at an exposure distance of 0.5-1.5cm ranges from 5 to 57s. An actinometric comparison of the sterilization data shows that atomic oxygen radicals play a significant role in plasma sterilization. When observed under a scanning electron microscope, the average size of the spores appears to be greatly reduced due to chemical reactions with the oxygen radicals.

Experiments and PIC simulations on liquid crystal plasma mirrors for pulse contrast enhancement

NASA Astrophysics Data System (ADS)

Cochran, G. E.; Poole, P. L.; Krygier, A.; Foster, P. S.; Scott, G. G.; Wilson, L. A.; Bailey, J.; Bourgeois, N.; Hernandez-Gomez, C.; Heery, R.; Purcell, J.; Neely, D.; Rajeev, P. P.; Freeman, R. R.; Schumacher, D. W.

2016-10-01

High pulse contrast is crucial for performing many experiments on high intensity lasers in order to minimize modification of the target surface by pre-pulse. This is often achieved through the use of solid dielectric plasma mirrors which can limit laser shot rates. Liquid crystal films, originally developed as variable thickness ion acceleration targets, have been demonstrated as effective plasma mirrors for pulse cleaning, reaching peak reflectivities over 70%. These films were used as plasma mirrors in an ion acceleration experiment on the Scarlet laser and the resultant increase in peak proton energy and change in acceleration direction will be discussed. Also presented here are novel 2D3V, LSP particle-in-cell simulations of dielectric plasma mirror operation. By including multiphoton ionization and dimensionality corrections, an excellent match to experiment is obtained over 4 decades in intensity. Analysis of pulse shortening and plasma critical surface behavior in these simulations will be discussed. Formation of thin films at 1.5 Hz will also be presented. Performed with support from the DARPA PULSE program through AMRDEC, from NNSA, and from OSC.

Process for testing a xenon gas feed system of a hollow cathode assembly

NASA Technical Reports Server (NTRS)

Patterson, Michael J. (Inventor); Verhey, Timothy R. R. (Inventor); Soulas, George C. (Inventor)

2004-01-01

The design and manufacturing processes for Hollow Cathode Assemblies (HCA's) that operate over a broad range of emission currents up to 30 Amperes, at low potentials, with lifetimes in excess of 17,500 hours. The processes include contamination control procedures which cover hollow cathode component cleaning procedures, gas feed system designs and specifications, and hollow cathode activation and operating procedures to thereby produce cathode assemblies that have demonstrated stable and repeatable operating conditions, for both the discharge current and voltage. The HCA of this invention provides lifetimes of greater than 10,000 hours, and expected lifetimes of greater than 17,500 hours, whereas the present state-of-the-art is less than 500 hours at emission currents in excess of 1 Ampere. Stable operation is provided over a large range of operating emission currents, up to a 6:1 ratio, and this HCA can emit electron currents of up to 30 Amperes in magnitude to an external anode that simulates the current drawn to a space plasma, at voltages of less than 20 Volts.

Process for Ignition of Gaseous Electrical Discharge Between Electrodes of a Hollow Cathode Assembly

NASA Technical Reports Server (NTRS)

Patterson, Michael J. (Inventor); Verhey, Timothy R. R. (Inventor); Soulas, George C. (Inventor)

2000-01-01

The design and manufacturing processes for Hollow Cathode Assemblies (HCA's) that operate over a broad range of emission currents up to 30 Amperes, at low potentials, with lifetimes in excess of 17,500 hours. The processes include contamination control procedures which cover hollow cathode component cleaning procedures, gas feed system designs and specifications, and hollow cathode activation and operating procedures to thereby produce cathode assemblies that have demonstrated stable and repeatable operating conditions, for both the discharge current and voltage. The HCA of this invention provides lifetimes of greater than 10,000 hours, and expected lifetimes of greater than 17,500 hours, whereas the present state-of-the-art is less than 500 hours at emission currents in excess of 1 Ampere. Stable operation is provided over a large range of operating emission currents, up to a 6:1 ratio, and this HCA can emit electron currents of up to 30 Amperes in magnitude to an external anode that simulates the current drawn to a space plasma, at voltages of less than 20 Volts.

Fluid bed gasification--plasma converter process generating energy from solid waste: experimental assessment of sulphur species.

PubMed

Morrin, Shane; Lettieri, Paola; Chapman, Chris; Taylor, Richard

2014-01-01

Often perceived as a Cinderella material, there is growing appreciation for solid waste as a renewable content thermal process feed. Nonetheless, research on solid waste gasification and sulphur mechanisms in particular is lacking. This paper presents results from two related experiments on a novel two stage gasification process, at demonstration scale, using a sulphur-enriched wood pellet feed. Notable SO2 and relatively low COS levels (before gas cleaning) were interesting features of the trials, and not normally expected under reducing gasification conditions. Analysis suggests that localised oxygen rich regions within the fluid bed played a role in SO2's generation. The response of COS to sulphur in the feed was quite prompt, whereas SO2 was more delayed. It is proposed that the bed material sequestered sulphur from the feed, later aiding SO2 generation. The more reducing gas phase regions above the bed would have facilitated COS--hence its faster response. These results provide a useful insight, with further analysis on a suite of performed experiments underway, along with thermodynamic modelling. Copyright © 2013 Elsevier Ltd. All rights reserved.

Surface Analysis Evaluation of Handwipe Cleaning for the Space Shuttle RSRM

NASA Technical Reports Server (NTRS)

Lesley, Michael W.; Anderson, Erin L.; McCool, Alex (Technical Monitor)

2001-01-01

In this paper we discuss the role of surface-sensitive spectroscopy (electron spectroscopy for chemical analysis, or ESCA) in the selection of solvents to replace 1,1,1-trichloroethane in handwipe cleaning of bonding surfaces on NASA's Space Shuttle Reusable Solid Rocket Motor (RSRM). Removal of common process soils from a wide variety of metallic and polymeric substrates was characterized. The cleaning efficiency was usually more dependent on the type of substrate being cleaned and the specific process soil than on the solvent used. A few substrates that are microscopically rough or porous proved to be difficult to clean with any cleaner, and some soils were very tenacious and difficult to remove from any substrate below detection limits. Overall, the work showed that a wide variety of solvents will perform at least as well as 1,1,1-trichloroethane.

Electrostatic Hazard Considerations for ODC Solvent Replacement Selection Testing

NASA Technical Reports Server (NTRS)

Fairbourn, Brad

1999-01-01

ODC solvents are used to clean many critical substrates during solid rocket motor production operations. Electrostatic charge generation incidental to these cleaning operations can pose a major safety issue. Therefore, while determining the acceptability of various ODC replacement cleaners, one aspect of the selection criteria included determining the extent of electric charge generation during a typical solvent cleaning operation. A total of six candidate replacement cleaners, sixteen critical substrates, and two types of cleaning swatch materials were studied in simulated cleaning operations. Charge generation and accumulation effects were investigated by measuring the peak voltage and brush discharging effects associated with each cleaning process combination. In some cases, charge generation was found to be very severe. Using the conductivity information for each cleaner, the peak voltage data could in some cases, be qualitatively predicted. Test results indicated that severe charging effects could result in brush discharges that could potentially result in flash fire hazards when occurring in close proximity to flammable vapor/air mixtures. Process controls to effectively mitigate these hazards are discussed.

Validation of cleaning method for various parts fabricated at a Beryllium facility

DOE Office of Scientific and Technical Information (OSTI.GOV)

Davis, Cynthia M.

This study evaluated and documented a cleaning process that is used to clean parts that are fabricated at a beryllium facility at Los Alamos National Laboratory. The purpose of evaluating this cleaning process was to validate and approve it for future use to assure beryllium surface levels are below the Department of Energy’s release limits without the need to sample all parts leaving the facility. Inhaling or coming in contact with beryllium can cause an immune response that can result in an individual becoming sensitized to beryllium, which can then lead to a disease of the lungs called chronic berylliummore » disease, and possibly lung cancer. Thirty aluminum and thirty stainless steel parts were fabricated on a lathe in the beryllium facility, as well as thirty-two beryllium parts, for the purpose of testing a parts cleaning method that involved the use of ultrasonic cleaners. A cleaning method was created, documented, validated, and approved, to reduce beryllium contamination.« less

NATO/CCMS PILOT STUDY - CLEAN PRODUCTS AND PROCESSES

EPA Science Inventory

The proposed objective of the NATO/CCMS Pilot on clean products and processes is to facilitate further gains in pollution prevention, waste minimization, and design for the environment. It is anticipated that the free exchange of knowledge, experience, data, and models will fost...

SITE TECHNOLOGY CAPSULE: CLEAN BERKSHIRES, INC. THERMAL DESORPTION SYSTEM

EPA Science Inventory

The thermal desorption process devised by Clean Berkshires, Inc., works by vaporizing the organic contaminants from the soil with heat, isolating the contaminant! in a gas stream, and then destroying them in a high efficiency afterburner. The processed solids are either replaced ...

Microwave exposure as a fast and cost-effective alternative of oxygen plasma treatment of indium-tin oxide electrode for application in organic solar cells

NASA Astrophysics Data System (ADS)

Soultati, Anastasia; Kostis, Ioannis; Papadimitropoulos, Giorgos; Zeniou, Angelos; Gogolides, Evangelos; Alexandropoulos, Dimitris; Vainos, Nikos; Davazoglou, Dimitris; Speliotis, Thanassis; Stathopoulos, Nikolaos A.; Argitis, Panagiotis; Vasilopoulou, Maria

2017-12-01

Pre-treatment methods are commonly employed to clean as well as to modify electrode surfaces. Many previous reports suggest that modifying the surface properties of indium tin oxide (ITO) by oxygen plasma treatment is a crucial step for the fabrication of high performance organic solar cells. In this work, we propose a fast and cost-effective microwave exposure step for the modification of the surface properties of ITO anode electrodes used in organic solar cells. It is demonstrated that a short microwave exposure improves the hydrophilicity and reduces the roughness of the ITO surface, as revealed by contact angle and atomic force microscopy (AFM) measurements, respectively, leading to a better quality of the PEDOT:PSS film coated on top of it. Similar results were obtained with the commonly used oxygen plasma treatment of ITO suggesting that microwave exposure is an effective process for modifying the surface properties of ITO with the benefits of low-cost, easy and fast processing. In addition, the influence of the microwave exposure of ITO anode electrode on the performance of an organic solar cell based on the poly(3-hexylthiophene):[6,6]-phenyl C70 butyric acid methyl ester (P3HT:PC70BM) blend is investigated. The 71% efficiency enhancement obtained in the microwave annealed-ITO based device as compared to the device with the as-received ITO was mainly attributed to the improvement in the short circuit current (J sc) and decreased leakage current caused by the reduced series and the increased shunt resistances and also by the higher charge generation efficiency, and the reduced recombination losses.

Accurate determination of non-metallic impurities in high purity tetramethylammonium hydroxide using inductively coupled plasma tandem mass spectrometry

NASA Astrophysics Data System (ADS)

Fu, Liang; Xie, Hualin; Shi, Shuyun; Chen, Xiaoqing

2018-06-01

The content of non-metallic impurities in high-purity tetramethylammonium hydroxide (HPTMAH) aqueous solution has an important influence on the yield, electrical properties and reliability of the integrated circuit during the process of chip etching and cleaning. Therefore, an efficient analytical method to directly quantify the content of non-metallic impurities in HPTMAH aqueous solutions is necessary. The present study was aimed to develop a novel method that can accurately determine seven non-metallic impurities (B, Si, P, S, Cl, As, and Se) in an aqueous solution of HPTMAH by inductively coupled plasma tandem mass spectrometry (ICP-MS/MS). The samples were measured using a direct injection method. In the MS/MS mode, oxygen and hydrogen were used as reaction gases in the octopole reaction system (ORS) to eliminate mass spectral interferences during the analytical process. The detection limits of B, Si, P, S, Cl, As, and Se were 0.31, 0.48, 0.051, 0.27, 3.10, 0.008, and 0.005 μg L-1, respectively. The samples were analyzed by the developed method and the sector field inductively coupled plasma mass spectrometry (SF-ICP-MS) was used for contrastive analysis. The values of these seven elements measured using ICP-MS/MS were consistent with those measured by SF-ICP-MS. The proposed method can be utilized to analyze non-metallic impurities in HPTMAH aqueous solution. Table S2 Multiple potential interferences on the analytes. Table S3 Parameters of calibration curve and the detection limit (DL). Table S4 Results obtained for 25% concentration high-purity grade TMAH aqueous solution samples (μg L-1, mean ± standard deviation, n = 10).

Automated processing of endoscopic surgical instruments.

PubMed

Roth, K; Sieber, J P; Schrimm, H; Heeg, P; Buess, G

1994-10-01

This paper deals with the requirements for automated processing of endoscopic surgical instruments. After a brief analysis of the current problems, solutions are discussed. Test-procedures have been developed to validate the automated processing, so that the cleaning results are guaranteed and reproducable. Also a device for testing and cleaning was designed together with Netzsch Newamatic and PCI, called TC-MIC, to automate processing and reduce manual work.

Automated Array Assembly Task In-depth Study of Silicon Wafer Surface Texturizing

NASA Technical Reports Server (NTRS)

Jones, G. T.; Chitre, S.; Rhee, S. S.; Allison, K. L.

1979-01-01

A low cost wafer surface texturizing process was studied. An investigation of low cost cleaning operations to clean residual wax and organics from the surface of silicon wafers was made. The feasibility of replacing dry nitrogen with clean dry air for drying silicon wafers was examined. The two stage texturizing process was studied for the purpose of characterizing relevant parameters in large volume applications. The effect of gettering solar cells on photovoltaic energy conversion efficiency is described.

Evaluation of various cleaning methods to remove bacillus spores from spacecraft hardware materials

NASA Technical Reports Server (NTRS)

Venkateswaran, Kasthuri; Chung, Shirley; Allton, Judith; Kern, Roger

2004-01-01

A detailed study was made of the biological cleaning effectiveness, defined in terms of the ability to remove bacterial spores, of a number of methods used to clean hardware surfaces. Aluminum (Al 6061) and titanium (Ti 6Al-4V) were chosen for the study as they were deemed the two materials most likely to be used in spacecraft extraterrestrial sampler construction. Metal coupons (1 cm x 2.5 cm) were precleaned and inoculated with 5.8 x 10(3) cultivable Bacillus subtilis spores, which are commonly found on spacecraft surfaces and in the assembly environments. The inoculated coupons were subsequently cleaned using: (1) 70% isopropyl alcohol wipe; (2) water wipe; (3) multiple-solvent flight-hardware cleaning procedures used at the Jet Propulsion Laboratory (JPL); (4) Johnson Space Center-developed ultrapure water rinse; and (5) a commercial, semi-aqueous, multiple-solvent (SAMS) cleaning process. The biological cleaning effectiveness was measured by agar plate assay, sterility test (growing in liquid media), and epifluorescent microscopy. None of the cleaning protocols tested completely removed viable spores from the surface of the aluminum. In contrast, titanium was capable of being cleaned to sterility by two methods, the JPL standard and the commercial SAMS cleaning process. Further investigation showed that the passivation step employed in the JPL standard method is an effective surface sterilant on both metals but not compatible with aluminum. It is recommended that titanium (Ti 6Al-4V) be considered superior to aluminum (Al 6061) for use in spacecraft sampling hardware, both for its potential to be cleaned to sterilization and for its ability to withstand the most effective cleaning protocols.

Evaluation of Various Cleaning Methods to Remove Bacillus Spores from Spacecraft Hardware Materials

NASA Astrophysics Data System (ADS)

Venkateswaran, Kasthuri; Chung, Shirley; Allton, Judith; Kern, Roger

2004-09-01

A detailed study was made of the biological cleaning effectiveness, defined in terms of the ability to remove bacterial spores, of a number of methods used to clean hardware surfaces. Aluminum (Al 6061) and titanium (Ti 6Al-4V) were chosen for the study as they were deemed the two materials most likely to be used in spacecraft extraterrestrial sampler construction. Metal coupons (1 cm × 2.5 cm) were precleaned and inoculated with 5.8 × 103 cultivable Bacillus subtilis spores, which are commonly found on spacecraft surfaces and in the assembly environments. The inoculated coupons were subsequently cleaned using: (1) 70% isopropyl alcohol wipe; (2) water wipe; (3) multiple-solvent flight-hardware cleaning procedures used at the Jet Propulsion Laboratory (JPL); (4) Johnson Space Center-developed ultrapure water rinse; and (5) a commercial, semi-aqueous, multiple-solvent (SAMS) cleaning process. The biological cleaning effectiveness was measured by agar plate assay, sterility test (growing in liquid media), and epifluorescent microscopy. None of the cleaning protocols tested completely removed viable spores from the surface of the aluminum. In contrast, titanium was capable of being cleaned to sterility by two methods, the JPL standard and the commercial SAMS cleaning process. Further investigation showed that the passivation step employed in the JPL standard method is an effective surface sterilant on both metals but not compatible with aluminum. It is recommended that titanium (Ti 6Al-4V) be considered superior to aluminum (Al 6061) for use in spacecraft sampling hardware, both for its potential to be cleaned to sterilization and for its ability to withstand the most effective cleaning protocols.

Evaluation of various cleaning methods to remove bacillus spores from spacecraft hardware materials.

PubMed

Venkateswaran, Kasthuri; Chung, Shirley; Allton, Judith; Kern, Roger

2004-01-01

A detailed study was made of the biological cleaning effectiveness, defined in terms of the ability to remove bacterial spores, of a number of methods used to clean hardware surfaces. Aluminum (Al 6061) and titanium (Ti 6Al-4V) were chosen for the study as they were deemed the two materials most likely to be used in spacecraft extraterrestrial sampler construction. Metal coupons (1 cm x 2.5 cm) were precleaned and inoculated with 5.8 x 10(3) cultivable Bacillus subtilis spores, which are commonly found on spacecraft surfaces and in the assembly environments. The inoculated coupons were subsequently cleaned using: (1) 70% isopropyl alcohol wipe; (2) water wipe; (3) multiple-solvent flight-hardware cleaning procedures used at the Jet Propulsion Laboratory (JPL); (4) Johnson Space Center-developed ultrapure water rinse; and (5) a commercial, semi-aqueous, multiple-solvent (SAMS) cleaning process. The biological cleaning effectiveness was measured by agar plate assay, sterility test (growing in liquid media), and epifluorescent microscopy. None of the cleaning protocols tested completely removed viable spores from the surface of the aluminum. In contrast, titanium was capable of being cleaned to sterility by two methods, the JPL standard and the commercial SAMS cleaning process. Further investigation showed that the passivation step employed in the JPL standard method is an effective surface sterilant on both metals but not compatible with aluminum. It is recommended that titanium (Ti 6Al-4V) be considered superior to aluminum (Al 6061) for use in spacecraft sampling hardware, both for its potential to be cleaned to sterilization and for its ability to withstand the most effective cleaning protocols.

Contribution of the backstreaming ions to the Self-Magnetic pinch (SMP) diode current

DOE Office of Scientific and Technical Information (OSTI.GOV)

Mazarakis, Michael G.; Cuneo, Michael E.; Fournier, Sean D.

2016-08-08

Summary form only given. The results presented here were obtained with an SMP diode mounted at the front high voltage end of the RITS accelerator. RITS is a Self-Magnetically Insulated Transmission Line (MITL) voltage adder that adds the voltage pulses of six 1.3 MV inductively insulated cavities. Our experiments had two objectives: first to measure the contribution of the back-streaming ion currents emitted from the anode target to the diode beam current, and second to try to evaluate the energy of those ions and hence the actual Anode-Cathode (A-K) gap actual voltage. In any very high voltage inductive voltage addermore » (IVA) utilizing MITLs to transmit the power to the diode load, the precise knowledge of the accelerating voltage applied on the anode-cathode (A-K) gap is problematic. The accelerating voltage quoted in the literature is from estimates based on measurements of the anode and cathode currents of the MITL far upstream from the diode and utilizing the para-potential flow theories and inductive corrections. Thus it would be interesting to have another independent measurement to evaluate the A-K voltage. The diode's anode is made of a number of high Z metals in order to produce copious and energetic flash x-rays. The backstreaming currents are a strong fraction of the anode materials and their stage of cleanness and gas adsorption. We have measured the back-streaming ion currents emitted from the anode and propagating through a hollow cathode tip for various diode configurations and different techniques of target cleaning treatments, such as heating to very high temperatures with DC and pulsed current, with RF plasma cleaning and with both plasma cleaning and heating. Finally, we have also evaluated the A-K gap voltage by ion filtering techniques.« less

Qualification of local advanced cryogenic cleaning technology for 14nm photomask fabrication

NASA Astrophysics Data System (ADS)

Taumer, Ralf; Krome, Thorsten; Bowers, Chuck; Varghese, Ivin; Hopkins, Tyler; White, Roy; Brunner, Martin; Yi, Daniel

2014-10-01

The march toward tighter design rules, and thus smaller defects, implies stronger surface adhesion between defects and the photomask surface compared to past generations, thereby resulting in increased difficulty in photomask cleaning. Current state-of-the-art wet clean technologies utilize functional water and various energies in an attempt to produce similar yield to the acid cleans of previous generations, but without some of the negative side effects. Still, wet cleans have continued to be plagued with issues such as persistent particles and contaminations, SRAF and feature damages, leaving contaminants behind that accelerate photo-induced defect growth, and others. This paper details work done through a design of experiments (DOE) utilized to qualify an improved cryogenic cleaning technology for production in the Advanced Mask Technology Center (AMTC) advanced production lines for 20 and 14 nm processing. All work was conducted at the AMTC facility in Dresden, Germany utilizing technology developed by Eco-Snow Systems and RAVE LLC for their cryogenic local cleaning VC1200F platform. This system uses a newly designed nozzle, improved gaseous CO2 delivery, extensive filtration to remove hydrocarbons and minimize particle adders, and other process improvements to overcome the limitations of the previous generation local cleaning tool. AMTC has successfully qualified this cryogenic cleaning technology and is currently using it regularly to enhance production yields even at the most challenging technology nodes.

9 CFR 590.515 - Egg cleaning operations.

Code of Federal Regulations, 2010 CFR

2010-01-01

... 9 Animals and Animal Products 2 2010-01-01 2010-01-01 false Egg cleaning operations. 590.515... EGG PRODUCTS INSPECTION INSPECTION OF EGGS AND EGG PRODUCTS (EGG PRODUCTS INSPECTION ACT) Sanitary, Processing, and Facility Requirements § 590.515 Egg cleaning operations. (a) The following requirements shall...

9 CFR 590.515 - Egg cleaning operations.

Code of Federal Regulations, 2011 CFR

2011-01-01

... 9 Animals and Animal Products 2 2011-01-01 2011-01-01 false Egg cleaning operations. 590.515... EGG PRODUCTS INSPECTION INSPECTION OF EGGS AND EGG PRODUCTS (EGG PRODUCTS INSPECTION ACT) Sanitary, Processing, and Facility Requirements § 590.515 Egg cleaning operations. (a) The following requirements shall...

Changing the surface properties on naval steel as result of non-thermal plasma treatment

NASA Astrophysics Data System (ADS)

Hnatiuc, B.; Sabău, A.; Dumitrache, C. L.; Hnatiuc, M.; Crețu, M.; Astanei, D.

2016-08-01

The problem of corrosion, related to Biofouling formation, is an issue with very high importance in the maritime domain. According to new rules, the paints and all the technologies for the conditioning of naval materials must fulfil more restrictive environmental conditions. In order to solve this issue, different new clean technologies have been proposed. Among them, the use of non-thermal plasmas produced at atmospheric pressure plays a very important role. This study concerns the opportunity of plasma treatment for preparation or conditioning of naval steel OL36 type. The plasma reactors chosen for the experiments can operate at atmospheric pressure and are easy to use in industrial conditions. They are based on electrical discharges GlidArc and Spark, which already proved their efficiency for the surface activation or even for coatings of the surface. The non-thermal character of the plasma is ensured by a gas flow blown through the electrical discharges. One power supply has been used for reactors that provide a 5 kV voltage and a maximum current of 100 mA. The modifications of the surface properties and composition have been studied by XPS technique (X-ray Photoelectron Spectroscopy). There were taken into consideration 5 samples: 4 of them undergoing a Mini-torch plasma, a Gliding Spark, a GlidArc with dry air and a GlidArc with CO2, respectively the fifth sample which is the untreated witness. Before the plasma treatment, samples of naval steel were processed in order to obtain mechanical gloss. The time of treatment was chosen to 12 minutes. In the spectroscopic analysis, done on a ULVAC-PHI, Inc. PHI 5000 Versa Probe scanning XPS microprobe, a monocromated Al Kα X-ray source with a spot size of 100 μm2 was used to scan each sample while the photoelectrons were collected at a 45-degree take-off angle. Differences were found between atomic concentrations in each individual case, which proves that the active species produced by each type of plasma affects the surface properties of the treated naval steel.

Metabolic Labeling and Membrane Fractionation for Comparative Proteomic Analysis of Arabidopsis thaliana Suspension Cell Cultures

PubMed Central

Szymanski, Witold G.; Kierszniowska, Sylwia; Schulze, Waltraud X.

2013-01-01

Plasma membrane microdomains are features based on the physical properties of the lipid and sterol environment and have particular roles in signaling processes. Extracting sterol-enriched membrane microdomains from plant cells for proteomic analysis is a difficult task mainly due to multiple preparation steps and sources for contaminations from other cellular compartments. The plasma membrane constitutes only about 5-20% of all the membranes in a plant cell, and therefore isolation of highly purified plasma membrane fraction is challenging. A frequently used method involves aqueous two-phase partitioning in polyethylene glycol and dextran, which yields plasma membrane vesicles with a purity of 95% 1. Sterol-rich membrane microdomains within the plasma membrane are insoluble upon treatment with cold nonionic detergents at alkaline pH. This detergent-resistant membrane fraction can be separated from the bulk plasma membrane by ultracentrifugation in a sucrose gradient 2. Subsequently, proteins can be extracted from the low density band of the sucrose gradient by methanol/chloroform precipitation. Extracted protein will then be trypsin digested, desalted and finally analyzed by LC-MS/MS. Our extraction protocol for sterol-rich microdomains is optimized for the preparation of clean detergent-resistant membrane fractions from Arabidopsis thaliana cell cultures. We use full metabolic labeling of Arabidopsis thaliana suspension cell cultures with K15NO3 as the only nitrogen source for quantitative comparative proteomic studies following biological treatment of interest 3. By mixing equal ratios of labeled and unlabeled cell cultures for joint protein extraction the influence of preparation steps on final quantitative result is kept at a minimum. Also loss of material during extraction will affect both control and treatment samples in the same way, and therefore the ratio of light and heave peptide will remain constant. In the proposed method either labeled or unlabeled cell culture undergoes a biological treatment, while the other serves as control 4. PMID:24121251

Production of Au clusters by plasma gas condensation and their incorporation in oxide matrixes by sputtering

NASA Astrophysics Data System (ADS)

Figueiredo, N. M.; Serra, R.; Manninen, N. K.; Cavaleiro, A.

2018-05-01

Gold clusters were produced by plasma gas condensation method and studied in great detail for the first time. The influence of argon flow, discharge power applied to the Au target and aggregation chamber length on the size distribution and deposition rate of Au clusters was evaluated. Au clusters with sizes between 5 and 65 nm were deposited with varying deposition rates and size dispersion curves. Nanocomposite Au-TiO2 and Au-Al2O3 coatings were then deposited by alternating sputtering. These coatings were hydrophobic and showed strong colorations due to the surface plasmon resonance effect. By simulating the optical properties of the nanocomposites it was possible to identify each individual contribution to the overall surface plasmon resonance signal. These coatings show great potential to be used as high performance localized surface plasmon resonance sensors or as robust self-cleaning decorative protective layers. The hybrid method used for depositing the nanocomposites offers several advantages over co-sputtering or thermal evaporation processes, since a broader range of particle sizes can be obtained (up to tens of nanometers) without the application of any thermal annealing treatments and the properties of clusters and matrix can be controlled separately.

The effect of copper substrate’s roughness on graphene growth process via PECVD

NASA Astrophysics Data System (ADS)

Fan, Tengfei; Yan, Cuixia; Lu, Jianchen; Zhang, Lianchang; Cai, Jinming

2018-04-01

Despite many excellent properties, the synthesis of high quality graphene with low-cost way is still a challenge, thus many different factors have been researched. In this work, the effect of surface roughness to the graphene quality was studied. Graphene was synthesized by plasma enhanced chemical vapor deposition (PECVD) method on copper substrates with different roughness from 0.074 μm to 0.339 μm, which were prepared via annealing, corrosion or polishing, respectively. Ar+ plasma cleaning was applied before graphene growth in order to accommodate similar surface chemical reactivity to each other. Scanning electron microscope and Raman spectroscope were employed to investigate the effect of surface roughness, which reveals that the graphene quality decrease first and then increase again according to the ratio of ID/IG in Raman spectroscopy. When the ratio of ID/IG reaches the largest number, the substrate roughness is 0.127 μm, where is the graphene quality changing point. First principle calculation was applied to explain the phenomenon and revealed that it is strongly affected by the graphene grain size and quantity which can induce defects. This strategy is expected to guide the industrial production of graphene.

Plasma needle: treatment of living cells and tissues

NASA Astrophysics Data System (ADS)

Stoffels, Eva

2003-10-01

Non-thermal plasmas are capable of refined treatment of heat sensitive surfaces. Recently, many non-thermal sources working under atmospheric pressure have been constructed. Their main applications are various surface treatments: cleaning, etching, changing the wettability/adhesion, and bacterial decontamination. A new research at the Eindhoven University of Technology focuses on in vivo treatment by means of a novel non-thermal plasma source (the plasma needle). At present, a fundamental study has been undertaken to identify all possible responses of living objects exposed to the plasma. Plasma treatment does not lead to cell death (necrosis), which is a cause of inflammation. On the contrary, we observe various sophisticated reactions of mammalian cells, e.g. cell detachment (loss of cell contact) and programmed cell death (apoptosis). Moreover, under certain conditions the plasma is capable of killing bacteria, while eukaryotic cells remain unharmed. These findings may result in development of new techniques, like bacterial sterilization of infected (living) tissues or removal of cells without inflammatory response, and on a longer time scale to new methods in the health care. Possible applications include treatment of skin ailments, aiding wound healing and sterilization of dental cavities.

Risk in cleaning: chemical and physical exposure.

PubMed

Wolkoff, P; Schneider, T; Kildesø, J; Degerth, R; Jaroszewski, M; Schunk, H

1998-04-23

Cleaning is a large enterprise involving a large fraction of the workforce worldwide. A broad spectrum of cleaning agents has been developed to facilitate dust and dirt removal, for disinfection and surface maintenance. The cleaning agents are used in large quantities throughout the world. Although a complex pattern of exposure to cleaning agents and resulting health problems, such as allergies and asthma, are reported among cleaners, only a few surveys of this type of product have been performed. This paper gives a broad introduction to cleaning agents and the impact of cleaning on cleaners, occupants of indoor environments, and the quality of cleaning. Cleaning agents are usually grouped into different product categories according to their technical functions and the purpose of their use (e.g. disinfectants and surface care products). The paper also indicates the adverse health and comfort effects associated with the use of these agents in connection with the cleaning process. The paper identifies disinfectants as the most hazardous group of cleaning agents. Cleaning agents contain evaporative and non-evaporative substances. The major toxicologically significant constituents of the former are volatile organic compounds (VOCs), defined as substances with boiling points in the range of 0 degree C to about 400 degrees C. Although laboratory emission testing has shown many VOCs with quite different time-concentration profiles, few field studies have been carried out measuring the exposure of cleaners. However, both field studies and emission testing indicate that the use of cleaning agents results in a temporal increase in the overall VOC level. This increase may occur during the cleaning process and thus it can enhance the probability of increased short-term exposure of the cleaners. However, the increased levels can also be present after the cleaning and result in an overall increased VOC level that can possibly affect the indoor air quality (IAQ) perceived by occupants. The variety and duration of the emissions depend inter alia on the use of fragrances and high boiling VOCs. Some building materials appear to increase their VOC emission through wet cleaning and thus may affect the IAQ. Particles and dirt contain a great variety of both volatile and non-volatile substances, including allergens. While the volatile fraction can consist of more than 200 different VOCs including formaldehyde, the non-volatile fraction can contain considerable amounts (> 0.5%) of fatty acid salts and tensides (e.g. linear alkyl benzene sulphonates). The level of these substances can be high immediately after the cleaning process, but few studies have been conducted concerning this problem. The substances partly originate from the use of cleaning agents. Both types are suspected to be airway irritants. Cleaning activities generate dust, mostly by resuspension, but other occupant activities may also resuspend dust over longer periods of time. Personal sampling of VOCs and airborne dust gives higher results than stationary sampling. International bodies have proposed air sampling strategies. A variety of field sampling techniques for VOC and surface particle sampling is listed.

Material Surface Characteristics and Plasma Performance in the Lithium Tokamak Experiment

DOE Office of Scientific and Technical Information (OSTI.GOV)

Lucia, Matthew James

The performance of a tokamak plasma and the characteristics of the surrounding plasma facing component (PFC) material surfaces strongly influence each other. Despite this relationship, tokamak plasma physics has historically been studied more thoroughly than PFC surface physics. The disparity is particularly evident in lithium PFC research: decades of experiments have examined the effect of lithium PFCs on plasma performance, but the understanding of the lithium surface itself is much less complete. This latter information is critical to identifying the mechanisms by which lithium PFCs affect plasma performance. This research focused on such plasma-surface interactions in the Lithium Tokamak Experimentmore » (LTX), a spherical torus designed to accommodate solid or liquid lithium as the primary PFC. Surface analysis was accomplished via the novel Materials Analysis and Particle Probe (MAPP) diagnostic system. In a series of experiments on LTX, the MAPP x-ray photoelectron spectroscopy (XPS) and thermal desorption spectroscopy (TDS) capabilities were used for in vacuo interrogation of PFC samples. This represented the first application of XPS and TDS for in situ surface analysis of tokamak PFCs. Surface analysis indicated that the thin (d ~ 100nm) evaporative lithium PFC coatings in LTX were converted to Li2O due to oxidizing agents in both the residual vacuum and the PFC substrate. Conversion was rapid and nearly independent of PFC temperature, forming a majority Li2O surface within minutes and an entirely Li2O surface within hours. However, Li2O PFCs were still capable of retaining hydrogen and sequestering impurities until the Li2O was further oxidized to LiOH, a process that took weeks. For hydrogen retention, Li2O PFCs retained H+ from LTX plasma discharges, but no LiH formation was observed. Instead, results implied that H+ was only weakly-bound, such that it almost completely outgassed as H2 within minutes. For impurity sequestration, LTX plasma performance—ascertained from plasma current and density measurements—progressively improved as plasma carbon and oxygen impurity levels fell. This was true for PFC conditioning by vacuum baking and argon glow discharge cleaning, as well as by lithium evaporation. Some evidence suggested that impurity sequestration was more important than hydrogen retention in enhancing LTX plasma performance. In contrast with expectations for lithium PFCs, heating the Li2O PFCs in LTX caused increased plasma impurity levels that tended to reduce plasma performance.« less

SEMICONDUCTOR TECHNOLOGY A new cleaning process for the metallic contaminants on a post-CMP wafer's surface

NASA Astrophysics Data System (ADS)

Baohong, Gao; Yuling, Liu; Chenwei, Wang; Yadong, Zhu; Shengli, Wang; Qiang, Zhou; Baimei, Tan

2010-10-01

This paper presents a new cleaning process using boron-doped diamond (BDD) film anode electrochemical oxidation for metallic contaminants on polished silicon wafer surfaces. The BDD film anode electrochemical oxidation can efficiently prepare pyrophosphate peroxide, pyrophosphate peroxide can oxidize organic contaminants, and pyrophosphate peroxide is deoxidized into pyrophosphate. Pyrophosphate, a good complexing agent, can form a metal complex, which is a structure consisting of a copper ion, bonded to a surrounding array of two pyrophosphate anions. Three polished wafers were immersed in the 0.01 mol/L CuSO4 solution for 2 h in order to make comparative experiments. The first one was cleaned by pyrophosphate peroxide, the second by RCA (Radio Corporation of America) cleaning, and the third by deionized (DI) water. The XPS measurement result shows that the metallic contaminants on wafers cleaned by the RCA method and by pyrophosphate peroxide is less than the XPS detection limits of 1 ppm. And the wafer's surface cleaned by pyrophosphate peroxide is more efficient in removing organic carbon residues than RCA cleaning. Therefore, BDD film anode electrochemical oxidation can be used for microelectronics cleaning, and it can effectively remove organic contaminants and metallic contaminants in one step. It also achieves energy saving and environmental protection.

40 CFR 60.253 - Standards for pneumatic coal-cleaning equipment.

Code of Federal Regulations, 2013 CFR

2013-07-01

... 40 Protection of Environment 7 2013-07-01 2013-07-01 false Standards for pneumatic coal-cleaning... PROGRAMS (CONTINUED) STANDARDS OF PERFORMANCE FOR NEW STATIONARY SOURCES Standards of Performance for Coal Preparation and Processing Plants § 60.253 Standards for pneumatic coal-cleaning equipment. (a) On and after...

40 CFR 60.253 - Standards for pneumatic coal-cleaning equipment.

Code of Federal Regulations, 2011 CFR

2011-07-01

... 40 Protection of Environment 6 2011-07-01 2011-07-01 false Standards for pneumatic coal-cleaning... PROGRAMS (CONTINUED) STANDARDS OF PERFORMANCE FOR NEW STATIONARY SOURCES Standards of Performance for Coal Preparation and Processing Plants § 60.253 Standards for pneumatic coal-cleaning equipment. (a) On and after...

40 CFR 60.253 - Standards for pneumatic coal-cleaning equipment.

Code of Federal Regulations, 2012 CFR

2012-07-01

... 40 Protection of Environment 7 2012-07-01 2012-07-01 false Standards for pneumatic coal-cleaning... PROGRAMS (CONTINUED) STANDARDS OF PERFORMANCE FOR NEW STATIONARY SOURCES Standards of Performance for Coal Preparation and Processing Plants § 60.253 Standards for pneumatic coal-cleaning equipment. (a) On and after...

40 CFR 60.253 - Standards for pneumatic coal-cleaning equipment.

Code of Federal Regulations, 2010 CFR

2010-07-01

... 40 Protection of Environment 6 2010-07-01 2010-07-01 false Standards for pneumatic coal-cleaning... PROGRAMS (CONTINUED) STANDARDS OF PERFORMANCE FOR NEW STATIONARY SOURCES Standards of Performance for Coal Preparation and Processing Plants § 60.253 Standards for pneumatic coal-cleaning equipment. (a) On and after...

40 CFR 60.253 - Standards for pneumatic coal-cleaning equipment.

Code of Federal Regulations, 2014 CFR

2014-07-01

... 40 Protection of Environment 7 2014-07-01 2014-07-01 false Standards for pneumatic coal-cleaning... PROGRAMS (CONTINUED) STANDARDS OF PERFORMANCE FOR NEW STATIONARY SOURCES Standards of Performance for Coal Preparation and Processing Plants § 60.253 Standards for pneumatic coal-cleaning equipment. (a) On and after...

One-step selective electrokinetic removal of inorganic anions from small volumes and its application as sample clean-up for mass spectrometric techniques.

PubMed

Tubaon, Ria Marni; Haddad, Paul R; Quirino, Joselito P

2017-03-10

The presence of inorganic anions in a sample interferes with mass spectrometric (MS) analysis. Here, a simple method to remove these ions from a liquid sample in one-step is described. The inorganic anions present in a 50μL sample were extracted into a low pH solution inside a 200μm i.d.×33cm long capillary by the use of an electric field. The selective removal of unwanted anions and retention of target analytes was accomplished by control of the apparent electrophoretic velocities of anions and analytes at a boundary that separated the sample and extraction solution. No physical barrier (e.g., membrane) was required and with the boundary situated at the tip of the capillary, efficient removal of inorganic anions (e.g., >80% removal) and good recovery of target analytes (e.g., >80% recovery) were achieved. The time required for removal of the inorganic anions was found to depend on their initial concentrations. The removal process was investigated using different concentrations of bromide and nitrate (as potassium salts) and negatively chargeable drugs as target analytes. This micro-sample clean-up technique used no organic solvents and little consumables and was studied to the determination of 0.6μg/L arsenic and 8.3μg/L vanadium in 500mg/L sodium chloride using inductively coupled plasma MS and 50μM angiotensin I in 1000mg/L sodium chloride using electrospray ionisation MS. Micro-sample clean-up was performed for 45min at 3kV in both demonstrations. The calculated recoveries for the metals at trace levels were 110-130%, and for the peptide was 103.8%. Copyright © 2017 Elsevier B.V. All rights reserved.

The Interaction of Spacecraft Cabin Atmospheric Quality and Water Processing System Performance

NASA Technical Reports Server (NTRS)

Perry, Jay L.; Croomes, Scott D. (Technical Monitor)

2002-01-01

Although designed to remove organic contaminants from a variety of waste water streams, the planned U.S.- and present Russian-provided water processing systems onboard the International Space Station (ISS) have capacity limits for some of the more common volatile cleaning solvents used for housekeeping purposes. Using large quantities of volatile cleaning solvents during the ground processing and in-flight operational phases of a crewed spacecraft such as the ISS can lead to significant challenges to the water processing systems. To understand the challenges facing the management of water processing capacity, the relationship between cabin atmospheric quality and humidity condensate loading is presented. This relationship is developed as a tool to determine the cabin atmospheric loading that may compromise water processing system performance. A comparison of cabin atmospheric loading with volatile cleaning solvents from ISS, Mir, and Shuttle are presented to predict acceptable limits to maintain optimal water processing system performance.

Environmental monitoring of the orbiter payload bay and Orbiter Processing Facilities

NASA Technical Reports Server (NTRS)

Bartelson, D. W.; Johnson, A. M.

1985-01-01

Contamination control in the Orbiter Processing Facility (OPF) is studied. The clean level required in the OPF is generally clean, which means no residue, dirt, debris, or other extraneous contamination; various methods of maintaining this level of cleanliness are described. The monitoring and controlling of the temperature, relative humidity, and air quality in the OPF are examined. Additional modifications to the OPF to improve contamination control are discussed. The methods used to maintain the payload changeout room at a level of visually clean, no particulates are to be detected by the unaided eye, are described. The payload bay (PLB) must sustain the cleanliness level required for the specific Orbiter's mission; the three levels of clean are defined as: (1) standard, (2) sensitive, and (3) high sensitive. The cleaning and inspection verification required to achieve the desired cleanliness level on a variety of PLB surface types are examined.

Characterization of Laser Cleaning of Artworks

PubMed Central

Marczak, Jan; Koss, Andrzej; Targowski, Piotr; Góra, Michalina; Strzelec, Marek; Sarzyński, Antoni; Skrzeczanowski, Wojciech; Ostrowski, Roman; Rycyk, Antoni

2008-01-01

The main tasks of conservators of artworks and monuments are the estimation and analysis of damages (present condition), object conservation (cleaning process), and the protection of an object against further degradation. One of the physical methods that is becoming more and more popular for dirt removal is the laser cleaning method. This method is non-contact, selective, local, controlled, self-limiting, gives immediate feedback and preserves even the gentlest of relief - the trace of a paintbrush. Paper presents application of different, selected physical sensing methods to characterize condition of works of art as well as laser cleaning process itself. It includes, tested in our laboratories, optical surface measurements (e.g. colorimetry, scatterometry, interferometry), infrared thermography, optical coherent tomography and acoustic measurements for “on-line” evaluation of cleaning progress. Results of laser spectrometry analyses (LIBS, Raman) will illustrate identification and dating of objects superficial layers. PMID:27873884

78 FR 41025 - Submission for OMB Review; Comment Request

Federal Register 2010, 2011, 2012, 2013, 2014

2013-07-09

... that import seed for cleaning or processing, to enter into compliance agreements with APHIS. This... other information activities to enable the importation of seeds for cleaning and processing so that they...: Imported Seed and Screening. OMB Control Number: 0579-0124. Summary of Collection: The United States...

40 CFR 463.21 - Specialized definitions.

Code of Federal Regulations, 2010 CFR

2010-07-01

... AND STANDARDS PLASTICS MOLDING AND FORMING POINT SOURCE CATEGORY Cleaning Water Subcategory § 463.21... usage flow rate” for a plant with more than one plastics molding and forming process that uses cleaning... process and comes in contact with the plastic product over a period of one year. ...

Automated Reflectance Measurement System Designed and Fabricated to Determine the Limits of Atomic Oxygen Treatment of Art Through Contrast Optimization

NASA Technical Reports Server (NTRS)

Sechkar, Edward A.; Stueber, Thomas J.; Rutledge, Sharon K.

2000-01-01

Atomic oxygen generated in ground-based research facilities has been used to not only test erosion of candidate spacecraft materials but as a noncontact technique for removing organic deposits from the surfaces of artwork. NASA has patented the use of atomic oxygen to remove carbon-based soot contamination from fire-damaged artwork. The process of cleaning soot-damaged paintings with atomic oxygen requires exposures for variable lengths of time, dependent on the condition of a painting. Care must be exercised while cleaning to prevent the removal of pigment. The cleaning process must be stopped as soon as visual inspection or surface reflectance measurements indicate that cleaning is complete. Both techniques rely on optical comparisons of known bright locations against known dark locations on the artwork being cleaned. Difficulties arise with these techniques when either a known bright or dark location cannot be determined readily. Furthermore, dark locations will lighten with excessive exposure to atomic oxygen. Therefore, an automated test instrument to quantitatively characterize cleaning progression was designed and developed at the NASA Glenn Research Center at Lewis Field to determine when atomic oxygen cleaning is complete.

Effective reprocessing of reusable dispensers for surface disinfection tissues – the devil is in the details

PubMed Central

Kampf, Günter; Degenhardt, Stina; Lackner, Sibylle; Ostermeyer, Christiane

2014-01-01

Background: It has recently been reported that reusable dispensers for surface disinfection tissues may be contaminated, especially with adapted Achromobacter species 3, when products based on surface-active ingredients are used. Fresh solution may quickly become recontaminated if dispensers are not processed adequately. Methods: We evaluated the abilities of six manual and three automatic processes for processing contaminated dispensers to prevent recolonisation of a freshly-prepared disinfectant solution (Mikrobac forte 0.5%). Dispensers were left at room temperature for 28 days. Samples of the disinfectant solution were taken every 7 days and assessed quantitatively for bacterial contamination. Results: All automatic procedures prevented recolonisation of the disinfectant solution when a temperature of 60–70°C was ensured for at least 5 min, with or without the addition of chemical cleaning agents. Manual procedures prevented recontamination of the disinfectant solution when rinsing with hot water or a thorough cleaning step was performed before treating all surfaces with an alcohol-based disinfectant or an oxygen-releaser. Other cleaning and disinfection procedures, including the use of an alcohol-based disinfectant, did not prevent recolonisation. Conclusions: These results indicate that not all processes are effective for processing reusable dispensers for surface-disinfectant tissues, and that a high temperature during the cleaning step or use of a biofilm-active cleaning agent are essential. PMID:24653973

A novel approach to the pacemaker infection with non-thermal atmospheric pressure plasma

NASA Astrophysics Data System (ADS)

Zhang, Yuchen; Li, Yu; Li, Yinglong; Yu, Shuang; Li, Haiyan; Zhang, Jue

2017-08-01

Although the pacemaker (PM) is a key cardiac implantable electrical device for life-threatening arrhythmias treatment, the related infection is a challenge. Thus, the aim of this study is to validate cold plasma as a potential technology for the disinfection of infected pacemakers. Fifty donated PMs were cleaned and sterilized before use and then infected with Staphylococcus aureus ( S. aureus). Then, each experimental group was treated with cold plasma treatment for 1 min, 3 min, 5 min and 7 min, while the control group was immersed with sterilized water. Effectiveness of disinfection was evaluated by using CFU counting method and confocal laser scanning microscopy (CLSM). The physicochemical properties of water treated with cold plasma at different time were evaluated, including water temperature change and oxidation reduction potential (ORP). The major reactive species generated by the cold plasma equipment during cold plasma were analyzed with optical emission spectroscopy (OES). No live bacteria were detected with CFU counting method after 7 min of cold plasma treatment, which matches with the CLSM results. The ORP value of water and H2O2 concentration changed significantly after treating with cold plasma. Furthermore, reactive oxygen species (ROS) and reactive nitrogen species (RNS), especially NO, O (777 nm) and O (844 nm) were probably key inactivation agents in cold plasma treatment. These results indicate that cold plasma could be an effective technology for the disinfection of implantable devices.

Vapor purification with self-cleaning filter

DOEpatents

Josephson, Gary B.; Heath, William O.; Aardahl, Christopher L.

2003-12-09

A vapor filtration device including a first electrode, a second electrode, and a filter between the first and second electrodes is disclosed. The filter is formed of dielectric material and the device is operated by applying a first electric potential between the electrodes to polarize the dielectric material such that upon passing a vapor stream through the filter, particles from the vapor stream are deposited onto the filter. After depositing the particles a second higher voltage is applied between the electrodes to form a nonthermal plasma around the filter to vaporize the collected particles thereby cleaning the filter. The filter can be a packed bed or serpentine filter mat, and an optional upstream corona wire can be utilized to charge airborne particles prior to their deposition on the filter.

Dynamic determination of secondary electron emission using a calorimetric probe in a plasma immersion ion implantation experiment

NASA Astrophysics Data System (ADS)

Haase, Fabian; Manova, Darina; Hirsch, Dietmar; Mändl, Stephan; Kersten, Holger

2018-04-01

A passive thermal probe has been used to detect dynamic changes in the secondary electron emission (SEE). Oxidized and nitrided materials have been studied during argon ion sputtering in a plasma immersion ion implantation process. Identical measurements have been performed for the metallic state with high voltage pulses accelerating nitrogen ions towards the surface, supposedly forming a nitride layer. Energy flux data were combined with scanning electron microscopy images of the surface to obtain information about the actual surface composition as well as trends and changes during the process. Within the measurements, a direct comparison of the SEE within both employed ion species (argon and nitrogen) is possible while an absolute quantification is still open. Additionally, the nominal composition of the investigated oxide and nitride layers does not always correspond to stoichiometric compounds. Nevertheless, the oxides showed a remarkably higher SEE compared to the pure metals, while an indistinct behavior was observed for the nitrides: some higher, some lower than the clean metal surfaces. For the aluminum alloy AlMg3 a complex time dependent evolution was observed with consecutive oxidation/sputtering cycles leading to a very rough surface with a diminished oxide layer, leading to an almost black surface of the metal and non-reproducible changes in the SEE. The presented method is a versatile technique for measuring dynamic changes of the surface for materials commonly used in PVD processes with a time resolution of about 1 min, e.g. magnetron sputtering or HiPIMS, where changes in the target or electrode composition are occurring but cannot be measured directly.

Atmospheric pressure plasma jet with high-voltage power supply based on piezoelectric transformer.

PubMed

Babij, Michał; Kowalski, Zbigniew W; Nitsch, Karol; Silberring, Jerzy; Gotszalk, Teodor

2014-05-01

The dielectric barrier discharge plasma jet, an example of the nonthermal atmospheric pressure plasma jet (APPJ), generates low-temperature plasmas that are suitable for the atomization of volatile species and can also be served as an ionization source for ambient mass and ion mobility spectrometry. A new design of APPJ for mass spectrometry has been built in our group. In these plasma sources magnetic transformers (MTs) and inductors are typically used in power supplies but they present several drawbacks that are even more evident when dealing with high-voltage normally used in APPJs. To overcome these disadvantages, high frequency generators with the absence of MT are proposed in the literature. However, in the case of miniaturized APPJs these conventional power converters, built of ferromagnetic cores and inductors or by means of LC resonant tank circuits, are not so useful as piezoelectric transformer (PT) based power converters due to bulky components and small efficiency. We made and examined a novel atmospheric pressure plasma jet with PT supplier served as ionization source for ambient mass spectrometry, and especially mobile spectrometry where miniaturization, integration of components, and clean plasma are required. The objective of this paper is to describe the concept, design, and implementation of this miniaturized piezoelectric transformer-based atmospheric pressure plasma jet.

Atmospheric pressure plasma jet with high-voltage power supply based on piezoelectric transformer

DOE Office of Scientific and Technical Information (OSTI.GOV)

Babij, Michał; Kowalski, Zbigniew W., E-mail: zbigniew.w.kowalski@pwr.wroc.pl; Nitsch, Karol

The dielectric barrier discharge plasma jet, an example of the nonthermal atmospheric pressure plasma jet (APPJ), generates low-temperature plasmas that are suitable for the atomization of volatile species and can also be served as an ionization source for ambient mass and ion mobility spectrometry. A new design of APPJ for mass spectrometry has been built in our group. In these plasma sources magnetic transformers (MTs) and inductors are typically used in power supplies but they present several drawbacks that are even more evident when dealing with high-voltage normally used in APPJs. To overcome these disadvantages, high frequency generators with themore » absence of MT are proposed in the literature. However, in the case of miniaturized APPJs these conventional power converters, built of ferromagnetic cores and inductors or by means of LC resonant tank circuits, are not so useful as piezoelectric transformer (PT) based power converters due to bulky components and small efficiency. We made and examined a novel atmospheric pressure plasma jet with PT supplier served as ionization source for ambient mass spectrometry, and especially mobile spectrometry where miniaturization, integration of components, and clean plasma are required. The objective of this paper is to describe the concept, design, and implementation of this miniaturized piezoelectric transformer-based atmospheric pressure plasma jet.« less

Distortion control in 20MnCr5 bevel gears after liquid nitriding process to maintain precision dimensions

NASA Astrophysics Data System (ADS)

Mahendiran, M.; Kavitha, M.

2018-02-01

Robotic and automotive gears are generally very high precision components with limitations in tolerances. Bevel gears are more widely used and dimensionally very close tolerance components that need stability without any backlash or distortion for smooth and trouble free functions. Nitriding is carried out to enhance wear resistance of the surface. The aim of this paper is to reduce the distortion in liquid nitriding process, though plasma nitriding is preferred for high precision components. Various trials were conducted to optimize the process parameters, considering pre dimensional setting for nominal nitriding layer growth. Surface cleaning, suitable fixtures and stress relieving operations were also done to optimize the process. Micro structural analysis and Vickers hardness testing were carried out for analyzing the phase changes, variation in surface hardness and case depth. CNC gear testing machine was used for determining the distortion level. The presence of white layer was found for about 10-15μm in the case depth of 250± 3.5μm showing an average surface hardness of 670 HV. Hence the economical liquid nitriding process was successfully used for producing high hardness and wear resistant coating over 20MnCr5 material with less distortion and reduced secondary grinding process for dimensional control.

Effect of a new regeneration process by adsorption-coagulation and flocculation on the physicochemical properties and the detergent efficiency of regenerated cleaning solutions.

PubMed

Blel, Walid; Dif, Mehdi; Sire, Olivier

2015-05-15

Reprocessing soiled cleaning-in-place (CIP) solutions has large economic and environmental costs, and it would be cheaper and greener to recycle them. In food industries, recycling of CIP solutions requires a suitable green process engineered to take into account the extreme physicochemical conditions of cleaning while not altering the process efficiency. To this end, an innovative treatment process combining adsorption-coagulation with flocculation was tested on multiple recycling of acid and basic cleaning solutions. In-depth analysis of time-course evolutions was carried out in the physicochemical properties (concentration, surface tension, viscosity, COD, total nitrogen) of these solutions over the course of successive regenerations. Cleaning and disinfection efficiencies were assessed based on both microbiological analyses and organic matter detachment and solubilization from fouled stainless steel surfaces. Microbiological analyses using a resistant bacterial strain (Bacillus subtilis spores) highlighted that solutions regenerated up to 20 times maintained the same bactericidal efficiency as de novo NaOH solutions. The cleanability of stainless steel surfaces showed that regenerated solutions allow better surface wettability, which goes to explain the improved detachment and solubilization found on different types of organic and inorganic fouling. Copyright © 2015 Elsevier Ltd. All rights reserved.

Film loss-free cleaning chemicals for EUV mask lifetime elongation developed through combinatorial chemical screening

NASA Astrophysics Data System (ADS)

Choi, Jaehyuck; Kim, Jinsu; Lowe, Jeff; Dattilo, Davide; Koh, Soowan; Choi, Jun Yeol; Dietze, Uwe; Shoki, Tsutomu; Kim, Byung Gook; Jeon, Chan-Uk

2015-10-01

EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality and patterning performance can change during mask fabrication, EUV exposure, maintenance cleaning, shipping, or storage. SPM (Sulfuric acid peroxide mixture) which has been extensively used for acid cleaning of photomask and wafer has serious drawback for EUV mask cleaning. It shows severe film loss of tantalum-based absorber layers and limited removal efficiency of EUV-generated carbon contaminants on EUV mask surface. Here, we introduce such novel cleaning chemicals developed for EUV mask as almost film loss free for various layers of the mask and superior carbon removal performance. Combinatorial chemical screening methods allowed us to screen several hundred combinations of various chemistries and additives under several different process conditions of temperature and time, eventually leading to development of the best chemistry selections for EUV mask cleaning. Recently, there have been many activities for the development of EUV pellicle, driven by ASML and core EUV scanner customer companies. It is still important to obtain film-loss free cleaning chemicals because cleaning cycle of EUV mask should be much faster than that of optic mask mainly due to EUV pellicle lifetime. More frequent cleaning, combined with the adoption of new materials for EUV masks, necessitates that mask manufacturers closely examine the performance change of EUV masks during cleaning process. We have investigated EUV mask quality changes and film losses during 50 cleaning cycles using new chemicals as well as particle and carbon contaminant removal characteristics. We have observed that the performance of new chemicals developed is superior to current SPM or relevant cleaning chemicals for EUV mask cleaning and EUV mask lifetime elongation.

METHOD 200.5 - DETERMINATION OF TRACE ELEMENTS IN DRINKING WATER BY AXIALLY VIEWED INDUCTIVELY COUPLED PLASMA-ATOMIC EMISSION SPECTROMETRY

EPA Science Inventory

2.0 SUMMARY OF METHOD
2.1. A 50 mL aliquot of a well-mixed, non-filtered, acid preserved aqueous sample is accurately transferred to clean 50-mL plastic disposable digestion tube containing a mixture of nitric and hydrochloric acids. The aliquot is heated to 95 degrees C (+ o...

NATO/CCMS PILOT STUDY - CLEAN PRODUCTS AND PROCESSES (PHASE I) 2000 ANNUAL REPORT, NUMBER 242

EPA Science Inventory

This annual report presents the proceedings of the Third Annual NATO/CCMS pilot study meeting in Copenhagen, Denmark. Guest speakers focused on efforts in the area of research of clean products and processes, life cycle analysis, computer tools and pollution prevention.

NATO CCMS PILOT STUDY ON CLEAN PRODUCTS AND PROCESSES -(PHASE I) - 2002 ANNUAL REPORT

EPA Science Inventory

The annual report summarizes the activities of the NATO CCMS Pilot Study on clean products and processes for 2002, including the proceedings of the 2002 annual meeting held in Vilnius, Lithuania. The report presents a wealth of information on cleaner production activities in ove...

DEMONSTRATION OF A LIQUID CARBON DIOXIDE PROCESS FOR CLEANING METAL PARTS

EPA Science Inventory

The report gives results of a demonstration of liquid carbon dioxide (LCO2) as an alternative to chlorinated solvents for cleaning metal parts. It describes the LCO2 process, the parts tested, the contaminants removed, and results from preliminary laboratory testing and on-site d...

Evaluating the use of laser radiation in cleaning of copper embroidery threads on archaeological Egyptian textiles

NASA Astrophysics Data System (ADS)

Abdel-Kareem, Omar; Harith, M. A.

2008-07-01

Cleaning of copper embroidery threads on archaeological textiles is still a complicated conservation process, as most textile conservators believe that the advantages of using traditional cleaning techniques are less than their disadvantages. In this study, the uses of laser cleaning method and two modified recipes of wet cleaning methods were evaluated for cleaning of the corroded archaeological Egyptian copper embroidery threads on an archaeological Egyptian textile fabric. Some corroded copper thread samples were cleaned using modified recipes of wet cleaning method; other corroded copper thread samples were cleaned with Q-switched Nd:YAG laser radiation of wavelength 532 nm. All tested metal thread samples before and after cleaning were investigated using a light microscope and a scanning electron microscope with an energy dispersive X-ray analysis unit. Also the laser-induced breakdown spectroscopy (LIBS) technique was used for the elemental analysis of laser-cleaned samples to follow up the laser cleaning procedure. The results show that laser cleaning is the most effective method among all tested methods in the cleaning of corroded copper threads. It can be used safely in removing the corrosion products without any damage to both metal strips and fibrous core. The tested laser cleaning technique has solved the problems caused by other traditional cleaning techniques that are commonly used in the cleaning of metal threads on museum textiles.

Cleaning By Blasting With Pellets Of Dry Ice

NASA Technical Reports Server (NTRS)

Fody, Jody

1993-01-01

Dry process strips protective surface coats from parts to be cleaned, without manual scrubbing. Does not involve use of flammable or toxic solvents. Used to remove coats from variety of materials, including plastics, ceramics, ferrous and nonferrous metals, and composites. Adds no chemical-pollution problem to problem of disposal of residue of coating material. Process consists of blasting solid carbon dioxide (dry ice) pellets at surface to be cleaned. Pellets sublime on impact and pass into atmosphere as carbon dioxide gas. Size, harness, velocity, and quantity of pellets adjusted to suit coating material and substrate.

KSC-07pd0862

NASA Image and Video Library

2007-04-11

KENNEDY SPACE CENTER, FLA. -- In clean room C of Astrotech's Payload Processing Facility, a worker wearing a "bunny suit," or clean-room attire, begins removing the protective cover surrounding the Dawn spacecraft. In the clean room, the spacecraft will undergo further processing. Dawn's mission is to explore two of the asteroid belt's most intriguing and dissimilar occupants: asteroid Vesta and the dwarf planet Ceres. The Dawn mission is managed by JPL, a division of the California Institute of Technology in Pasadena, for NASA's Science Mission Directorate in Washington, D.C. Photo credit: NASA/George Shelton

KSC-07pd0863

NASA Image and Video Library

2007-04-11

KENNEDY SPACE CENTER, FLA. -- In clean room C of Astrotech's Payload Processing Facility, a worker wearing a "bunny suit," or clean-room attire, looks over the Dawn spacecraft after removing the protective cover, at bottom right. In the clean room, the spacecraft will undergo further processing. Dawn's mission is to explore two of the asteroid belt's most intriguing and dissimilar occupants: asteroid Vesta and the dwarf planet Ceres. The Dawn mission is managed by JPL, a division of the California Institute of Technology in Pasadena, for NASA's Science Mission Directorate in Washington, D.C. Photo credit: NASA/George Shelton

Experimental study of cleaning aircraft GTE fuel injectors using a vortex ejector

NASA Astrophysics Data System (ADS)

Evdokimov, O. A.; Piralishvili, Sh A.; Veretennikov, S. V.; Elkes, A. A.

2017-11-01

The main ways of cleaning the fuel injectors and the circuits of jet and vortex ejectors used for pumping gas, liquid and two-phase media, as well as for evacuation of enclosed spaces are analyzed. The possibility of organizing the process of pumping the liquid out of the fuel injection manifold secondary circuit using a vortex ejector is shown experimentally. The regimes of manifold evacuation at various inlet liquid pressure values are studied. The technology of carbon cleaning fuel injectors using a washing liquid at various working process parameters is tested.

Guidelines for qualifying cleaning and verification materials

NASA Technical Reports Server (NTRS)

Webb, D.

1995-01-01

This document is intended to provide guidance in identifying technical issues which must be addressed in a comprehensive qualification plan for materials used in cleaning and cleanliness verification processes. Information presented herein is intended to facilitate development of a definitive checklist that should address all pertinent materials issues when down selecting a cleaning/verification media.

Method for removing metals from a cleaning solution

DOEpatents

Deacon, Lewis E.

2002-01-01

A method for removing accumulated metals from a cleaning solution is provided. After removal of the metals, the cleaning solution can be discharged or recycled. The process manipulates the pH levels of the solution as a means of precipitating solids. Preferably a dual phase separation at two different pH levels is utilized.

RECYCLING A NONIONIC AQUEOUS-BASED METAL-CLEANING SOLUTION WITH A CERAMIC MEMBRANE: PILOT SCALE EVALUATION

EPA Science Inventory

The effectiveness of a zirconium dioxide (ZrO2) membrane filter was evaluated for recycling a nonionic aqueous metal cleaning bath under real-world conditions. The pilot-scale study consisted of four 7- to 16-day filtration runs, each processed a portion of the cleaning bath duri...

Idea Bank: Does Your Health Depend on a Clean Instrument?

ERIC Educational Resources Information Center

Gutoff, Olivia W.

2011-01-01

Music teachers have a responsibility to give detailed instruction on the regular cleaning of brass and wind instruments because of new, compelling research. Recent findings reinforce the importance of teaching proper instrument cleaning. Serious health consequences can be avoided by making instrument care an integral part of the educative process.…

Pilot Plant Program for the AED Advanced Coal Cleaning System. Phase II. Interim final report

DOE Office of Scientific and Technical Information (OSTI.GOV)

Not Available

1980-08-01

Advanced Energy Dynamics, Inc. (AED), has developed a proprietary coal cleaning process which employs a combination of ionization and electrostatic separation to remove both sulfur and ash from dry pulverized coal. The Ohio Department of Energy sponsored the first part of a program to evaluate, develop, and demonstrate the process in a continuous-flow pilot plant. Various coals used by Ohio electric utilities were characterized and classified, and sulfur reduction, ash reduction and Btu recovery were measured. Sulfur removal in various coals ranged from 33 to 68% (on a Btu basis). Ash removal ranged from 17 to 59% (on a Btumore » basis). Ash removal of particles greater than 53 microns ranged from 46 to 88%. Btu recovery ranged from 90 to 97%. These results, especially the large percentage removal of ash particles greater than 53 microns, suggest that the AED system can contribute materially to improved boiler performance and availability. The study indicated the following potential areas for commercial utilization of the AED process: installation between the pulverizer and boiler of conventional coal-fired power utilities; reclamation of fine coal refuse; dry coal cleaning to supplement, and, if necessary, to take the place of conventional coal cleaning; upgrading coal used in: (1) coal-oil mixtures, (2) gasification and liquefaction processes designed to handle pulverized coal; and (3) blast furnaces for making steel, as a fuel supplement to the coke. Partial cleaning of coking coal blends during preheating may also prove economically attractive. Numerous other industrial processes which use pulverized coal such as the production of activated carbon and direct reduction of iron ore may also benefit from the use of AED coal cleaning.« less

KENNEDY SPACE CENTER, FLA. - A KSC employee uses a clean-air shower before entering a clean room. Streams of pressurized air directed at the occupant from nozzles in the chamber's ceiling and walls are designed to dislodge particulate matter from hair, clothing and shoes. The adhesive mat on the floor captures soil from shoe soles, as well as particles that fall on its surface. Particulate matter has the potential to contaminate the space flight hardware being stored or processed in the clean room. The shower is part of KSC's Foreign Object Debris (FOD) control program, an important safety initiative.

NASA Image and Video Library

2003-08-29

KENNEDY SPACE CENTER, FLA. - A KSC employee uses a clean-air shower before entering a clean room. Streams of pressurized air directed at the occupant from nozzles in the chamber's ceiling and walls are designed to dislodge particulate matter from hair, clothing and shoes. The adhesive mat on the floor captures soil from shoe soles, as well as particles that fall on its surface. Particulate matter has the potential to contaminate the space flight hardware being stored or processed in the clean room. The shower is part of KSC's Foreign Object Debris (FOD) control program, an important safety initiative.

Advanced coal conversion process demonstration. Technical progress report for the period July 1, 1995--September 30, 1995

DOE Office of Scientific and Technical Information (OSTI.GOV)

NONE

1997-05-01

This report describes the technical progress made on the Advanced Coal Conversion Process (ACCP) Demonstration Project from July 1, 1995 through September 30, 1995. The ACCP Demonstration Project is a US Department of Energy (DOE) Clean Coal Technology Project. This project demonstrates an advanced, thermal, coal upgrading process, coupled with physical cleaning techniques, that is designed to upgrade high-moisture, low-rank coals to a high-quality, low-sulfur fuel, registered as the SynCoal process. The coal is processed through three stages (two heating stages followed by an inert cooling stage) of vibrating fluidized bed reactors that remove chemically bound water, carboxyl groups, andmore » volatile sulfur compounds. After thermal upgrading, the cola is put through a deep-bed stratifier cleaning process to separate the pyrite-rich ash from the coal.« less

DOE Office of Scientific and Technical Information (OSTI.GOV)

Singh, S. P.N.; Peterson, G. R.

Coal beneficiation is a generic term used for processes that prepare run-of-mine coal for specific end uses. It is also referred to as coal preparation or coal cleaning and is a means of reducing the sulfur and the ash contents of coal. Information is presented regarding current and potential coal beneficiation processes. Several of the processes reviewed, though not yet commercial, are at various stages of experimental development. Process descriptions are provided for these processes commensurate with the extent of information and time available to perform the evaluation of these processes. Conceptual process designs, preliminary cost estimates, and economic evaluationsmore » are provided for the more advanced (from a process development hierarchy viewpoint) processes based on production levels of 1500 and 15,000 tons/day (maf) of cleaned product coal. Economic evaluations of the coal preparation plants are conducted for several project financing schemes and at 12 and 15% annual after-tax rates of return on equity capital. A 9% annual interest rate is used on the debt fraction of the plant capital. Cleaned product coal prices are determined using the discounted cash flow procedure. The study is intended to provide information on publicly known coal beneficiation processes and to indicate the relative costs of various coal beneficiation processes. Because of severe timeconstraints, several potential coal beneficiation processes are not evaluated in great detail. It is recommended that an additional study be conducted to complement this study and to more fully appreciate the potentially significant role of coal beneficiation in the clean burning of coal.« less

[Assessment of decontamination processes: cleaning, disinfection and sterilization in dental practice in Poland in the years 2011-2012].

PubMed

Röhm-Rodowald, Ewa; Jakimiak, Bozenna; Chojecka, Agnieszka; Zmuda-Baranowska, Magdalena; Kanclerski, Krzysztof

2012-01-01

Effective decontamination of instruments is a key element of infection control and the provision of high quality in dental care. The aim of the study was to evaluate the efficiency of decontamination procedures including cleaning, disinfection and sterilization of re-usable instruments in dental practices in Poland. The efficiency of disinfection and sterilization processes have been evaluated on the results of the questionnaires. The following information were taken into account: setting where disinfection and sterilization had been performed, preparation of dental equipment for sterilization (disinfection, washing and cleaning, packaging), the types of autoclaves and used types of sterilization cycles, routine monitoring and documentation of sterilization processes, treatment of handpieces and the frequency of surface decontamination. Data were collected from 43 dental practices (35 dental offices and 8 clinics). Disinfection and cleaning processes were performed manually in 63% of dental offices and ultrasonic baths were used in 53% of settings. Washer disinfectors were used in 23% of dental practices: in every researched clinic and in a few dental offices. All sterilization processes were performed in steam autoclaves, mainly in small steam sterilizers (81%). Dental handpieces were sterilized in 72% of practices, but only 33% of them performed sterilization in recommended cycle B. Sterilization processes were monitored with chemical indicators in 33% of practices. Biological monitoring of the processes was carried out at different intervals. Incorrect documentation of instruments and surfaces decontamination was recorded in several settings. There is still a need for improvement of decontamination processes in dental practice in Poland. Areas for improvement include: replacement of manual cleaning and disinfection processes with automatic processes, sterilization of dental handpieces after each patient, monitoring of a sterilization process with chemical and biological indicators. Reported incorrect procedures in decontamination of medical devices performed by questioned dentists and lack or inadequate response to asked questions indicate the lack of adequate knowledge about decontamination. Personnel who performs decontamination processes should be continuously trained.

Tank 12H Acidic Chemical Cleaning Sample Analysis And Material Balance

DOE Office of Scientific and Technical Information (OSTI.GOV)

Martino, C. J.; Reboul, S. H.; Wiersma, B. J.

2013-11-08

A process of Bulk Oxalic Acid (BOA) chemical cleaning was performed for Tank 12H during June and July of 2013 to remove all or a portion of the approximately 4400 gallon sludge heel. Three strikes of oxalic acid (nominally 4 wt% or 2 wt%) were used at 55°C and tank volumes of 96- to 140-thousand gallons. This report details the sample analysis of a scrape sample taken prior to BOA cleaning and dip samples taken during BOA cleaning. It also documents a rudimentary material balance for the Tank 12H cleaning results.

Taguchi Experimental Design for Cleaning PWAs with Ball Grid Arrays

NASA Technical Reports Server (NTRS)

Bonner, J. K.; Mehta, A.; Walton, S.

1997-01-01

Ball grid arrays (BGAs), and other area array packages, are becoming more prominent as a way to increase component pin count while avoiding the manufacturing difficulties inherent in processing quad flat packs (QFPs)...Cleaning printed wiring assemblies (PWAs) with BGA components mounted on the surface is problematic...Currently, a low flash point semi-aqueous material, in conjunction with a batch cleaning unit, is being used to clean PWAs. The approach taken at JPL was to investigate the use of (1) semi-aqueous materials having a high flash point and (2) aqueous cleaning involving a saponifier.

Method for removal of beryllium contamination from an article

DOEpatents

Simandl, Ronald F.; Hollenbeck, Scott M.

2012-12-25

A method of removal of beryllium contamination from an article is disclosed. The method typically involves dissolving polyisobutylene in a solvent such as hexane to form a tackifier solution, soaking the substrate in the tackifier to produce a preform, and then drying the preform to produce the cleaning medium. The cleaning media are typically used dry, without any liquid cleaning agent to rub the surface of the article and remove the beryllium contamination below a non-detect level. In some embodiments no detectible residue is transferred from the cleaning wipe to the article as a result of the cleaning process.

Megasonic cleaning strategy for sub-10nm photomasks

NASA Astrophysics Data System (ADS)

Hsu, Jyh-Wei; Samayoa, Martin; Dress, Peter; Dietze, Uwe; Ma, Ai-Jay; Lin, Chia-Shih; Lai, Rick; Chang, Peter; Tuo, Laurent

2016-10-01

One of the main challenges in photomask cleaning is balancing particle removal efficiency (PRE) with pattern damage control. To overcome this challenge, a high frequency megasonic cleaning strategy is implemented. Apart from megasonic frequency and power, photomask surface conditioning also influences cleaning performance. With improved wettability, cleanliness is enhanced while pattern damage risk is simultaneously reduced. Therefore, a particle removal process based on higher megasonic frequencies, combined with proper surface pre-treatment, provides improved cleanliness without the unintended side effects of pattern damage, thus supporting the extension of megasonic cleaning technology into 10nm half pitch (hp) device node and beyond.

Mechanical vs. manual cleaning of hospital beds: a prospective intervention study.

PubMed

Hopman, J; Nillesen, M; de Both, E; Witte, J; Teerenstra, S; Hulscher, M; Voss, A

2015-06-01

Cleaning regimens for hospital beds were evaluated in the context of a rising prevalence of highly resistant micro-organisms and increasing financial pressure on healthcare systems. Dutch hospitals have to choose between standardized, mechanical bed-washers advised in national guidance and manual cleaning. To evaluate the quality of mechanical and manual bed-cleaning regimens. The multi-faceted analysis of bed-cleaning regimens consisted of three steps. In Step 1, the training of the domestic service team was evaluated. In Step 2, the cleaning quality of manual and mechanical regimens was assessed. Soiled beds, obtained at random, from different departments were evaluated using microbiological analysis (N = 40) and ATP (N = 20). ATP and microbiological contamination were measured in five predetermined locations on all beds. In Step 3, manual cleaning was introduced over a two-month pilot study at the surgical short-stay unit, and beds from other departments were processed according to the 'gold standard' mechanical cleaning. ATP levels were evaluated in three locations on 300 beds after cleaning. Training was found to improve the quality of cleaning significantly. Mechanical cleaning resulted in significantly lower ATP levels than manual cleaning. Mechanical cleaning shows less variation and results in consistently lower ATP levels than manual cleaning. Copyright © 2015 The Healthcare Infection Society. Published by Elsevier Ltd. All rights reserved.

Bench-scale performance testing and economic analyses of electrostatic dry coal cleaning. Final report, October 1980-July 1983

DOE Office of Scientific and Technical Information (OSTI.GOV)

Rich, S.R.

1987-02-01

The report gives results of preliminary performance evaluations and economic analyses of the Advanced Energy Dynamics (AED) electrostatic dry coal-cleaning process. Grab samples of coal-feed-product coals were obtained from 25 operating physical coal-cleaning (PCC) plants. These samples were analyzed for ash, sulfur, and energy content and splits of the original samples of feed run-of-mine coal were provided for bench-scale testing in an electrostatic separation apparatus. The process showed superior sulfur-removal performance at equivalent cost and energy-recovery levels. The ash-removal capability of the process was not evaluated completely: overall, ash-removal results indicated that the process did not perform as well asmore » the PCC plants.« less

Rapid formation of phase-clean 110 K (Bi-2223) powders derived via freeze-drying process

DOEpatents

Balachandran, Uthamalingam

1996-01-01

A process for the preparation of amorphous precursor powders for Pb-doped Bi.sub.2 Sr.sub.2 Ca.sub.2 Cu.sub.3 O.sub.x (2223) includes a freeze-drying process incorporating a splat-freezing step. The process generally includes splat freezing a nitrate solution of Bi, Pb, Sr, Ca, and Cu to form flakes of the solution without any phase separation; grinding the frozen flakes to form a powder; freeze-drying the frozen powder; heating the dried powder to form a dry green precursor powders; denitrating the green-powders; heating the denitrated powders to form phase-clean Bi-2223 powders. The grain boundaries of the 2223 grains appear to be clean, leading to good intergrain contact between 2223 grains.

Rapid formation of phase-clean 110 K (Bi-2223) powders derived via freeze-drying process

DOEpatents

Balachandran, U.

1996-06-04

A process for the preparation of amorphous precursor powders for Pb-doped Bi{sub 2}Sr{sub 2} Ca{sub 2}Cu{sub 3}O{sub x} (2223) includes a freeze-drying process incorporating a splat-freezing step. The process generally includes splat freezing a nitrate solution of Bi, Pb, Sr, Ca, and Cu to form flakes of the solution without any phase separation; grinding the frozen flakes to form a powder; freeze-drying the frozen powder; heating the dried powder to form a dry green precursor powders; denitrating the green-powders; heating the denitrated powders to form phase-clean Bi-2223 powders. The grain boundaries of the 2223 grains appear to be clean, leading to good intergrain contact between 2223 grains. 11 figs.

Biofilms of Enterococcus faecalis and Enterococcus faecium isolated from the processing of ricotta and the control of these pathogens through cleaning and sanitization procedures.

PubMed

da Silva Fernandes, Meg; Kabuki, Dirce Yorika; Kuaye, Arnaldo Yoshiteru

2015-05-04

The biofilm formation of Enterococcus faecalis and Enterococcus faecium isolated from the processing of ricotta on stainless steel coupons was evaluated, and the effect of cleaning and sanitization procedures in the control of these biofilms was determined. The formation of biofilms was observed while varying the incubation temperature (7, 25 and 39°C) and time (0, 1, 2, 4, 6 and 8 days). At 7°C, the counts of E. faecalis and E. faecium were below 2 log10 CFU/cm(2). For the temperatures of 25 and 39°C, after 1 day, the counts of E. faecalis and E. faecium were 5.75 and 6.07 log10 CFU/cm(2), respectively, which is characteristic of biofilm formation. The tested sanitation procedures a) acid-anionic tensioactive cleaning, b) anionic tensioactive cleaning+sanitizer and c) acid-anionic tensioactive cleaning+sanitizer were effective in removing the biofilms, reducing the counts to levels below 0.4 log10 CFU/cm(2). The sanitizer biguanide was the least effective, and peracetic acid was the most effective. These studies revealed the ability of enterococci to form biofilms and the importance of the cleaning step and the type of sanitizer used in sanitation processes for the effective removal of biofilms. Copyright © 2015 Elsevier B.V. All rights reserved.

Novel Cleanup Agents Designed Exclusively for Oil Field Membrane Filtration Systems Low Cost Field Demonstrations of Cleanup Agents in Controlled Experimental Environments

DOE Office of Scientific and Technical Information (OSTI.GOV)

David Burnett; Harold Vance

2007-08-31

The goal of our project is to develop innovative processes and novel cleaning agents for water treatment facilities designed to remove fouling materials and restore micro-filter and reverse osmosis (RO) membrane performance. This project is part of Texas A&M University's comprehensive study of the treatment and reuse of oilfield brine for beneficial purposes. Before waste water can be used for any beneficial purpose, it must be processed to remove contaminants, including oily wastes such as residual petroleum hydrocarbons. An effective way of removing petroleum from brines is the use of membrane filters to separate oily waste from the brine. Texasmore » A&M and its partners have developed highly efficient membrane treatment and RO desalination for waste water including oil field produced water. We have also developed novel and new cleaning agents for membrane filters utilizing environmentally friendly materials so that the water from the treatment process will meet U.S. EPA drinking water standards. Prototype micellar cleaning agents perform better and use less clean water than alternate systems. While not yet optimized, the new system restores essentially complete membrane flux and separation efficiency after cleaning. Significantly the amount of desalinated water that is required to clean the membranes is reduced by more than 75%.« less

A comparative study on laser induced shock cleaning of radioactive contaminants in air and water

NASA Astrophysics Data System (ADS)

Kumar, Aniruddha; Prasad, Manisha; Bhatt, R. B.; Behere, P. G.; Biswas, D. J.

2018-03-01

Efficient removal of Uranium-di-oxide (UO2) particulates from stainless steel surface was effected by Nd-YAG laser induced plasma shock waves in air as well as in water environment. The propagation velocity of the generated shock wave was measured by employing the photo-acoustic probe deflection method. Monitoring of the alpha activity of the sample with a ZnS (Ag) scintillation detector before and after the laser exposure allowed the estimation of decontamination efficiency defined as the percentage removal of the initial activity. Experiments were carried out to study the effect of laser pulse energy, number of laser exposures, orientation of the sample, the separation between the substrate surface and the onset point of the shock wave on the de-contamination efficiency. The most optimised cleaning was found to occur when the laser beam impinged normally on the sample that was immersed in water and placed at a distance of ∼0.7 mm from the laser focal spot. Analysis of the cleaned surface by optical microscopes established that laser induced shock cleaning in no way altered the surface property. The shock force generated in both air and water has been estimated theoretically and has been found to exceed the Van der Waal's binding force for spherical contaminant particulate.

Final Report of NATO/SPS Pilot Study on Clean Products and Processes (Phase I and II)

EPA Science Inventory

Early in 1998 the NATO Committee for Challenges to Modern Society (SPS) (Science for Peace and Security) approved the Pilot Study on Clean Products and Processes for an initial period of five years. The pilot was to provide a forum for member country representatives to discuss t...

Influence of oxygen in atmospheric-pressure argon plasma jet on sterilization of Bacillus atrophaeous spores

DOE Office of Scientific and Technical Information (OSTI.GOV)

Lim, Jin-Pyo; Uhm, Han S.; Li, Shou-Zhe

2007-09-15

A nonequilibrium Ar/O{sub 2} plasma discharge at atmospheric pressure was carried out in a coaxial cylindrical reactor with a stepped electrode configuration powered by a 13.56 MHz rf power supplier. The argon glow discharge with high electron density produces oxygen reactive species in large quantities. Argon plasma jets penetrate deep into ambient air and create a path for oxygen radicals to sterilize microbes. A sterilization experiment with bacterial endospores indicates that an argon-oxygen plasma jet very effectively kills endospores of Bacillus atrophaeus (ATCC 9372), thereby demonstrating its capability to clean surfaces and its usefulness for reinstating contaminated equipment as freemore » from toxic biological warfare agents. The decimal reduction time (D values) of the Ar/O{sub 2} plasma jet at an exposure distance of 0.5-1.5 cm ranges from 5 to 57 s. An actinometric comparison of the sterilization data shows that atomic oxygen radicals play a significant role in plasma sterilization. When observed under a scanning electron microscope, the average size of the spores appears to be greatly reduced due to chemical reactions with the oxygen radicals.« less

EUV laser produced and induced plasmas for nanolithography

NASA Astrophysics Data System (ADS)

Sizyuk, Tatyana; Hassanein, Ahmed

2017-10-01

EUV produced plasma sources are being extensively studied for the development of new technology for computer chips production. Challenging tasks include optimization of EUV source efficiency, producing powerful source in 2 percentage bandwidth around 13.5 nm for high volume manufacture (HVM), and increasing the lifetime of collecting optics. Mass-limited targets, such as small droplet, allow to reduce contamination of chamber environment and mirror surface damage. However, reducing droplet size limits EUV power output. Our analysis showed the requirement for the target parameters and chamber conditions to achieve 500 W EUV output for HVM. The HEIGHTS package was used for the simulations of laser produced plasma evolution starting from laser interaction with solid target, development and expansion of vapor/plasma plume with accurate optical data calculation, especially in narrow EUV region. Detailed 3D modeling of mix environment including evolution and interplay of plasma produced by lasers from Sn target and plasma produced by in-band and out-of-band EUV radiation in ambient gas, used for the collecting optics protection and cleaning, allowed predicting conditions in entire LPP system. Effect of these conditions on EUV photon absorption and collection was analyzed. This work is supported by the National Science Foundation, PIRE project.

Aqueous Cleaning and Validation for Space Shuttle Propulsion Hardware at the White Sands Test Facility

NASA Technical Reports Server (NTRS)

Hornung, Steven D.; Biesinger, Paul; Kirsch, Mike; Beeson, Harold; Leuders, Kathy

1999-01-01

The NASA White Sands Test Facility (WSTF) has developed an entirely aqueous final cleaning and verification process to replace the current chlorofluorocarbon (CFC) 113 based process. This process has been accepted for final cleaning and cleanliness verification of WSTF ground support equipment. The aqueous process relies on ultrapure water at 50 C (323 K) and ultrasonic agitation for removal of organic compounds and particulate. The cleanliness is verified bv determining the total organic carbon (TOC) content and filtration with particulate counting. The effectiveness of the aqueous methods for detecting hydrocarbon contamination and particulate was compared to the accepted CFC 113 sampling procedures. Testing with known contaminants, such as hydraulic fluid and cutting and lubricating oils, to establish a correlation between aqueous TOC and CFC 113 nonvolatile residue (NVR) was performed. Particulate sampling on cleaned batches of hardware that were randomly separated and sampled by the two methods was performed. This paper presents the approach and results, and discusses the issues in establishing the equivalence of aqueous sampling to CFC 113 sampling, while describing the approach for implementing aqueous techniques on Space Shuttle Propulsion hardware.

Emission measurement and safety assessment for the production process of silicon nanoparticles in a pilot-scale facility

NASA Astrophysics Data System (ADS)

Wang, Jing; Asbach, Christof; Fissan, Heinz; Hülser, Tim; Kaminski, Heinz; Kuhlbusch, Thomas A. J.; Pui, David Y. H.

2012-03-01

Emission into the workplace was measured for the production process of silicon nanoparticles in a pilot-scale facility at the Institute of Energy and Environmental Technology e.V. (IUTA). The silicon nanoparticles were produced in a hot-wall reactor and consisted of primary particles around 60 nm in diameter. We employed real-time aerosol instruments to measure particle number and lung-deposited surface area concentrations and size distribution; airborne particles were also collected for off-line electron microscopic analysis. Emission of silicon nanoparticles was not detected during the processes of synthesis, collection, and bagging. This was attributed to the completely closed production system and other safety measures against particle release which will be discussed briefly. Emission of silicon nanoparticles significantly above the detection limit was only observed during the cleaning process when the production system was open and manually cleaned. The majority of the detected particles was in the size range of 100-400 nm and were silicon nanoparticle agglomerates first deposited in the tubing then re-suspended during the cleaning process. Appropriate personal protection equipment is recommended for safety protection of the workers during cleaning.

Surfactant/Supercritical Fluid Cleaning of Contaminated Substrates

NASA Technical Reports Server (NTRS)

White, Gary L.

1997-01-01

CFC's and halogenated hydrocarbon solvents have been the solvents of choice to degrease and otherwise clean precision metal parts to allow proper function. Recent regulations have, however, rendered most of these solvents unacceptable for these purposes. New processes which are being used or which have been proposed to replace these solvents usually either fail to remove water soluble contaminants or produce significant aqueous wastes which must then be disposed of. In this work, a new method for cleaning surfaces will be investigated. Solubility of typical contaminants such as lubricating greases and phosphatizing bath residues will be studied in several surfactant/supercritical fluid solutions. The effect of temperature, pressure, and the composition of the cleaning mixture on the solubility of oily, polar, and ionic contaminants will be investigated. A reverse micellar solution in a supercritical light hydrocarbon solvent will be used to clean samples of industrial wastes. A reverse micellar solution is one where water is dissolved into a non-polar solvent with the aid of a surfactant. The solution will be capable of dissolving both water-soluble contaminants and oil soluble contaminants. Once the contaminants have been dissolved into the solution they will be separated from the light hydrocarbon and precipitated by a relatively small pressure drop and the supercritical solvent will be available for recycle for reuse. The process will be compared to the efficacy of supercritical CO2 cleaning by attempting to clean the same types of substrates and machining wastes with the same contaminants using supercritical CO2. It is anticipated that the supercritical CO2 process will not be capable of removing ionic residues.

Recent Results of IRAN-T1 Tokamak

DOE Office of Scientific and Technical Information (OSTI.GOV)

Dorranian, D.; Ghoranneviss, M.; Salem, M. K.

2006-12-04

In this article after introducing the IR-T1 tokamak and its diagnostic systems a brief discussion on the range of grossly stable operating conditions of its plasma by Hugill diagram is presented. Hard disruption instability is studied experimentally in the next part, which confirms that MHD behavior in small tokamaks can be characterized by a single parameter q(a), safety factor at plasma edge. Finally the characteristics of the new regime of IR-T1 are reported. By our new model of triggering different fields (toroidal, ohmic and vertical), the plasma duration time is increased up to 35 ms with Ip of about 25more » kA. By modifying capacitance and charging voltage of ohmic and vertical fields the spike oscillations which was appeared in the plasma behavior is taken out. The role of cleaning the vacuum chamber and using heavier gas for glow discharge and the effect of base pressure is described in detail.« less

The formation of quasi-parallel shocks. [in space, solar and astrophysical plasmas

NASA Technical Reports Server (NTRS)

Cargill, Peter J.

1991-01-01

In a collisionless plasma, the coupling between a piston and the plasma must take place through either laminar or turbulent electromagnetic fields. Of the three types of coupling (laminar, Larmor and turbulent), shock formation in the parallel regime is dominated by the latter and in the quasi-parallel regime by a combination of all three, depending on the piston. In the quasi-perpendicular regime, there is usually a good separation between piston and shock. This is not true in the quasi-parallel and parallel regime. Hybrid numerical simulations for hot plasma pistons indicate that when the electrons are hot, a shock forms, but does not cleanly decouple from the piston. For hot ion pistons, no shock forms in the parallel limit: in the quasi-parallel case, a shock forms, but there is severe contamination from hot piston ions. These results suggest that the properties of solar and astrophysical shocks, such as particle acceleration, cannot be readily separated from their driving mechanism.

9 CFR 590.547 - Albumen flake process drying operations.

Code of Federal Regulations, 2014 CFR

2014-01-01

... operations. (a) The fermentation, drying, and curing rooms shall be kept in a dust-free clean condition and free of flies, insects, and rodents. (b) Drying units, racks, and trucks shall be kept in a clean and... clean condition. (d) Oils and waxes used in oiling drying pans or trays shall be of edible quality. (e...

9 CFR 590.547 - Albumen flake process drying operations.

Code of Federal Regulations, 2012 CFR

2012-01-01

... operations. (a) The fermentation, drying, and curing rooms shall be kept in a dust-free clean condition and free of flies, insects, and rodents. (b) Drying units, racks, and trucks shall be kept in a clean and... clean condition. (d) Oils and waxes used in oiling drying pans or trays shall be of edible quality. (e...

9 CFR 590.547 - Albumen flake process drying operations.

Code of Federal Regulations, 2013 CFR

2013-01-01

... operations. (a) The fermentation, drying, and curing rooms shall be kept in a dust-free clean condition and free of flies, insects, and rodents. (b) Drying units, racks, and trucks shall be kept in a clean and... clean condition. (d) Oils and waxes used in oiling drying pans or trays shall be of edible quality. (e...

9 CFR 590.547 - Albumen flake process drying operations.

Code of Federal Regulations, 2011 CFR

2011-01-01

... operations. (a) The fermentation, drying, and curing rooms shall be kept in a dust-free clean condition and free of flies, insects, and rodents. (b) Drying units, racks, and trucks shall be kept in a clean and... clean condition. (d) Oils and waxes used in oiling drying pans or trays shall be of edible quality. (e...

Process Monitoring Evaluation and Implementation for the Wood Abrasive Machining Process

PubMed Central

Saloni, Daniel E.; Lemaster, Richard L.; Jackson, Steven D.

2010-01-01

Wood processing industries have continuously developed and improved technologies and processes to transform wood to obtain better final product quality and thus increase profits. Abrasive machining is one of the most important of these processes and therefore merits special attention and study. The objective of this work was to evaluate and demonstrate a process monitoring system for use in the abrasive machining of wood and wood based products. The system developed increases the life of the belt by detecting (using process monitoring sensors) and removing (by cleaning) the abrasive loading during the machining process. This study focused on abrasive belt machining processes and included substantial background work, which provided a solid base for understanding the behavior of the abrasive, and the different ways that the abrasive machining process can be monitored. In addition, the background research showed that abrasive belts can effectively be cleaned by the appropriate cleaning technique. The process monitoring system developed included acoustic emission sensors which tended to be sensitive to belt wear, as well as platen vibration, but not loading, and optical sensors which were sensitive to abrasive loading. PMID:22163477

High throughput determination of cleaning solutions to prevent the fouling of an anion exchange resin.

PubMed

Elich, Thomas; Iskra, Timothy; Daniels, William; Morrison, Christopher J

2016-06-01

Effective cleaning of chromatography resin is required to prevent fouling and maximize the number of processing cycles which can be achieved. Optimization of resin cleaning procedures, however, can lead to prohibitive material, labor, and time requirements, even when using milliliter scale chromatography columns. In this work, high throughput (HT) techniques were used to evaluate cleaning agents for a monoclonal antibody (mAb) polishing step utilizing Fractogel(®) EMD TMAE HiCap (M) anion exchange (AEX) resin. For this particular mAb feed stream, the AEX resin could not be fully restored with traditional NaCl and NaOH cleaning solutions, resulting in a loss of impurity capacity with resin cycling. Miniaturized microliter scale chromatography columns and an automated liquid handling system (LHS) were employed to evaluate various experimental cleaning conditions. Cleaning agents were monitored for their ability to maintain resin impurity capacity over multiple processing cycles by analyzing the flowthrough material for turbidity and high molecular weight (HMW) content. HT experiments indicated that a 167 mM acetic acid strip solution followed by a 0.5 M NaOH, 2 M NaCl sanitization provided approximately 90% cleaning improvement over solutions containing solely NaCl and/or NaOH. Results from the microliter scale HT experiments were confirmed in subsequent evaluations at the milliliter scale. These results identify cleaning agents which may restore resin performance for applications involving fouling species in ion exchange systems. In addition, this work demonstrates the use of miniaturized columns operated with an automated LHS for HT evaluation of chromatographic cleaning procedures, effectively decreasing material requirements while simultaneously increasing throughput. Biotechnol. Bioeng. 2016;113: 1251-1259. © 2015 Wiley Periodicals, Inc. © 2015 Wiley Periodicals, Inc.

Shear stress cleaning for surface departiculation

NASA Technical Reports Server (NTRS)

Musselman, R. P.; Yarbrough, T. W.

1986-01-01

A cleaning technique widely used by the nuclear utility industry for removal of radioactive surface contamination has proven effective at removing non-hazardous contaminant particles as small as 0.1 micrometer. The process employs a controlled high velocity liquid spray inside a vapor containment enclosure to remove particles from a surface. The viscous drag force generated by the cleaning fluid applies a shear stress greater than the adhesion force that holds small particles to a substrate. Fluid mechanics and field tests indicate general cleaning parameters.

Balanced-Rotating-Spray Tank-And-Pipe-Cleaning System

NASA Technical Reports Server (NTRS)

Thaxton, Eric A.; Caimi, Raoul E. B.

1995-01-01

Spray head translates and rotates to clean entire inner surface of tank or pipe. Cleansing effected by three laterally balanced gas/liquid jets from spray head that rotates about longitudinal axis. Uses much less liquid. Cleaning process in system relies on mechanical action of jets instead of contaminant dissolution. Eliminates very difficult machining needed to make multiple converging/diverging nozzles within one spray head. Makes nozzle much smaller. Basic two-phase-flow, supersonic-nozzle design applied to other spray systems for interior or exterior cleaning.

NASA Tech Briefs, March 2006

NASA Technical Reports Server (NTRS)

2006-01-01

Topics covered include: Medical Signal-Conditioning and Data-Interface System; Instruments for Reading Direct-Marked Data-Matrix Symbols; Processing EOS MLS Level-2 Data; Ground Processing of Data From the Mars Exploration Rovers; Estimating Total Electron Content Using 1,000+ GPS Receivers; NASA Solar Array Demonstrates Commercial Potential; Improved Control of Charging Voltage for Li-Ion Battery; Programmable Pulse-Position-Modulation Encoder; Wavelength-Agile External-Cavity Diode Laser for DWDM; Pattern-Recognition Processor Using Holographic Photopolymer; Submicrosecond Power-Switching Test Circuit; Three-Function Logic Gate Controlled by Analog Voltage; Integrated System for Autonomous Science; Montage Version 3.0; Utilizing AI in Temporal, Spatial, and Resource Scheduling; Satellite Image Mosaic Engine; Architecture for Control of the K9 Rover; HFGMC Enhancement of MAC/GMC; Automated Activation and Deactivation of a System Under Test; Cleaning Carbon Nanotubes by Use of Mild Oxygen Plasmas; Generating Aromatics From CO2 on Mars or Natural Gas on Earth; Attaching Thermocouples by Peening or Crimping; Heat Treatment of Friction-Stir-Welded 7050 Aluminum Plates; Generating Breathable Air Through Dissociation of N2O; High-Performance Scanning Acousto-Ultrasonic System; Correction for Thermal EMFs in Thermocouple Feedthroughs; Using Quasiparticle Poisoning To Detect Photons; Estimating Resolution Lengths of Hybrid Turbulence Models; Education and Training Module in Alertness Management; Cargo-Positioning System for Next-Generation Spacecraft; Micro-Imagers for Spaceborne Cell-Growth Experiments; Holographic Solar Photon Thrusters; Plasma-Based Detector of Outer-Space Dust Particles; and Generation of Data-Rate Profiles of Ka-Band Deep-Space Links.

Achieving surface chemical and morphologic alterations on tantalum by plasma electrolytic oxidation.

PubMed

Goularte, Marcelo Augusto Pinto Cardoso; Barbosa, Gustavo Frainer; da Cruz, Nilson Cristino; Hirakata, Luciana Mayumi

2016-12-01

Search for materials that may either replace titanium dental implants or constitute an alternative as a new dental implant material has been widely studied. As well, the search for optimum biocompatible metal surfaces remains crucial. So, the aim of this work is to develop an oxidized surface layer on tantalum using plasma electrolytic oxidation (PEO) similar to those existing on oral implants been marketed today. Cleaned tantalum samples were divided into group 1 (control) and groups 2, 3, and 4 (treated by PEO for 1, 3, and 5 min, respectively). An electrolytic solution diluted in 1-L deionized water was used for the anodizing process. Then, samples were washed with anhydrous ethyl alcohol and dried in the open air. For complete anodic treatment disposal, the samples were immersed in acetone altogether, taken to the ultrasonic tank for 10 min, washed again in distilled water, and finally air-dried. For the scanning electron microscopy (SEM) analysis, all samples were previously coated with gold; the salt deposition analysis was conducted with an energy-dispersive X-ray spectroscopy (EDS) system integrated with the SEM unit. SEM images confirmed the changes on tantalum strips surface according to different exposure times while EDS analysis confirmed increased salt deposition as exposure time to the anodizing process also increased. PEO was able to produce both surface alteration and salt deposition on tantalum strips similar to those existing on oral implants been marketed today.

Fast quantitation of opioid isomers in human plasma by differential mobility spectrometry/mass spectrometry via SPME/open-port probe sampling interface.

PubMed

Liu, Chang; Gómez-Ríos, Germán Augusto; Schneider, Bradley B; Le Blanc, J C Yves; Reyes-Garcés, Nathaly; Arnold, Don W; Covey, Thomas R; Pawliszyn, Janusz

2017-10-23

Mass spectrometry (MS) based quantitative approaches typically require a thorough sample clean-up and a decent chromatographic step in order to achieve needed figures of merit. However, in most cases, such processes are not optimal for urgent assessments and high-throughput determinations. The direct coupling of solid phase microextraction (SPME) to MS has shown great potential to shorten the total sample analysis time of complex matrices, as well as to diminish potential matrix effects and instrument contamination. In this study, we demonstrate the use of the open-port probe (OPP) as a direct and robust sampling interface to couple biocompatible-SPME (Bio-SPME) fibres to MS for the rapid quantitation of opioid isomers (i.e. codeine and hydrocodone) in human plasma. In place of chromatography, a differential mobility spectrometry (DMS) device was implemented to provide the essential selectivity required to quantify these constitutional isomers. Taking advantage of the simplified sample preparation process based on Bio-SPME and the fast separation with DMS-MS coupling via OPP, a high-throughput assay (10-15 s per sample) with limits of detection in the sub-ng/mL range was developed. Succinctly, we demonstrated that by tuning adequate ion mobility separation conditions, SPME-OPP-MS can be employed to quantify non-resolved compounds or those otherwise hindered by co-extracted isobaric interferences without further need of coupling to other separation platforms. Copyright © 2017 Elsevier B.V. All rights reserved.

Dawn Spacecraft Processing

NASA Image and Video Library

2007-04-10

The Dawn spacecraft is seen here in clean room C of Astrotech's Payload Processing Facility. In the clean room, the spacecraft will undergo further processing. Dawn's mission is to explore two of the asteroid belt's most intriguing and dissimilar occupants: asteroid Vesta and the dwarf planet Ceres. The Dawn mission is managed by JPL, a division of the California Institute of Technology in Pasadena, for NASA's Science Mission Directorate in Washington, D.C.

Fabrication of nanometer single crystal metallic CoSi2 structures on Si

NASA Technical Reports Server (NTRS)

Nieh, Kai-Wei (Inventor); Lin, True-Lon (Inventor); Fathauer, Robert W. (Inventor)

1991-01-01

Amorphous Co:Si (1:2 ratio) films are electron gun-evaporated on clean Si(111), such as in a molecular beam epitaxy system. These layers are then crystallized selectively with a focused electron beam to form very small crystalline Co/Si2 regions in an amorphous matrix. Finally, the amorphous regions are etched away selectively using plasma or chemical techniques.

Effect of different methods of preliminary surface treatment and magnetron sputtering on the adhesion of Si coatings

NASA Astrophysics Data System (ADS)

Borisov, D. P.; Slabodchikov, V. A.; Kuznetsov, V. M.

2017-05-01

The paper presents research results on the adhesion of Si coatings deposited by magnetron sputtering on NiTi substrates after preliminary surface treatment (cleaning and activation) with low-energy ion beams and gas discharge plasma. The adhesion properties of the coatings obtained by two methods are analyzed and compared using data of scratch and spherical abrasion tests.