Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling

NASA Astrophysics Data System (ADS)

Fomenkov, Igor; Brandt, David; Ershov, Alex; Schafgans, Alexander; Tao, Yezheng; Vaschenko, Georgiy; Rokitski, Slava; Kats, Michael; Vargas, Michael; Purvis, Michael; Rafac, Rob; La Fontaine, Bruno; De Dea, Silvia; LaForge, Andrew; Stewart, Jayson; Chang, Steven; Graham, Matthew; Riggs, Daniel; Taylor, Ted; Abraham, Mathew; Brown, Daniel

2017-06-01

Extreme ultraviolet (EUV) lithography is expected to succeed in 193-nm immersion multi-patterning technology for sub-10-nm critical layer patterning. In order to be successful, EUV lithography has to demonstrate that it can satisfy the industry requirements in the following critical areas: power, dose stability, etendue, spectral content, and lifetime. Currently, development of second-generation laser-produced plasma (LPP) light sources for the ASML's NXE:3300B EUV scanner is complete, and first units are installed and operational at chipmaker customers. We describe different aspects and performance characteristics of the sources, dose stability results, power scaling, and availability data for EUV sources and also report new development results.

Atomic processes and equation of state of high Z plasmas for EUV sources and their effects on the spatial and temporal evolution of the plasmas

NASA Astrophysics Data System (ADS)

Sasaki, Akira; Sunahara, Atushi; Furukawa, Hiroyuki; Nishihara, Katsunobu; Nishikawa, Takeshi; Koike, Fumihiro

2016-03-01

Laser-produced plasma (LPP) extreme ultraviolet (EUV) light sources have been intensively investigated due to potential application to next-generation semiconductor technology. Current studies focus on the atomic processes and hydrodynamics of plasmas to develop shorter wavelength sources at λ = 6.x nm as well as to improve the conversion efficiency (CE) of λ = 13.5 nm sources. This paper examines the atomic processes of mid-z elements, which are potential candidates for λ = 6.x nm source using n=3-3 transitions. Furthermore, a method to calculate the hydrodynamics of the plasmas in terms of the initial interaction between a relatively weak prepulse laser is presented.

Characteristics of extreme ultraviolet emission from high-Z plasmas

NASA Astrophysics Data System (ADS)

Ohashi, H.; Higashiguchi, T.; Suzuki, Y.; Kawasaki, M.; Suzuki, C.; Tomita, K.; Nishikino, M.; Fujioka, S.; Endo, A.; Li, B.; Otsuka, T.; Dunne, P.; O'Sullivan, G.

2016-03-01

We demonstrate the extreme ultraviolet (EUV) and soft x-ray sources in the 2 to 7 nm spectral region related to the beyond EUV (BEUV) question at 6.x nm and the water window source based on laser-produced high-Z plasmas. Resonance emission from multiply charged ions merges to produce intense unresolved transition arrays (UTAs), extending below the carbon K edge (4.37 nm). An outline of a microscope design for single-shot live cell imaging is proposed based on high-Z plasma UTA source, coupled to multilayer mirror optics.

Nanoimaging using soft X-ray and EUV laser-plasma sources

NASA Astrophysics Data System (ADS)

Wachulak, Przemyslaw; Torrisi, Alfio; Ayele, Mesfin; Bartnik, Andrzej; Czwartos, Joanna; Węgrzyński, Łukasz; Fok, Tomasz; Fiedorowicz, Henryk

2018-01-01

In this work we present three experimental, compact desk-top imaging systems: SXR and EUV full field microscopes and the SXR contact microscope. The systems are based on laser-plasma EUV and SXR sources based on a double stream gas puff target. The EUV and SXR full field microscopes, operating at 13.8 nm and 2.88 nm wavelengths are capable of imaging nanostructures with a sub-50 nm spatial resolution and short (seconds) exposure times. The SXR contact microscope operates in the "water-window" spectral range and produces an imprint of the internal structure of the imaged sample in a thin layer of SXR sensitive photoresist. Applications of such desk-top EUV and SXR microscopes, mostly for biological samples (CT26 fibroblast cells and Keratinocytes) are also presented. Details about the sources, the microscopes as well as the imaging results for various objects will be presented and discussed. The development of such compact imaging systems may be important to the new research related to biological, material science and nanotechnology applications.

Kr photoionized plasma induced by intense extreme ultraviolet pulses

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bartnik, A., E-mail: andrzej.bartnik@wat.edu.pl; Wachulak, P.; Fiedorowicz, H.

Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Krmore » plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.« less

Kr photoionized plasma induced by intense extreme ultraviolet pulses

NASA Astrophysics Data System (ADS)

Bartnik, A.; Wachulak, P.; Fiedorowicz, H.; Skrzeczanowski, W.

2016-04-01

Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Kr plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.

Debris- and radiation-induced damage effects on EUV nanolithography source collector mirror optics performance

NASA Astrophysics Data System (ADS)

Allain, J. P.; Nieto, M.; Hendricks, M.; Harilal, S. S.; Hassanein, A.

2007-05-01

Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources to debris (fast ions, neutrals, off-band radiation, droplets) remains one of the highest critical issues of source component lifetime and commercial feasibility of nanolithography at 13.5-nm. Typical radiators used at 13.5-nm include Xe and Sn. Fast particles emerging from the pinch region of the lamp are known to induce serious damage to nearby collector mirrors. Candidate collector configurations include either multi-layer mirrors (MLM) or single-layer mirrors (SLM) used at grazing incidence. Studies at Argonne have focused on understanding the underlying mechanisms that hinder collector mirror performance at 13.5-nm under fast Sn or Xe exposure. This is possible by a new state-of-the-art in-situ EUV reflectometry system that measures real time relative EUV reflectivity (15-degree incidence and 13.5-nm) variation during fast particle exposure. Intense EUV light and off-band radiation is also known to contribute to mirror damage. For example offband radiation can couple to the mirror and induce heating affecting the mirror's surface properties. In addition, intense EUV light can partially photo-ionize background gas (e.g., Ar or He) used for mitigation in the source device. This can lead to local weakly ionized plasma creating a sheath and accelerating charged gas particles to the mirror surface and inducing sputtering. In this paper we study several aspects of debris and radiation-induced damage to candidate EUVL source collector optics materials. The first study concerns the use of IMD simulations to study the effect of surface roughness on EUV reflectivity. The second studies the effect of fast particles on MLM reflectivity at 13.5-nm. And lastly the third studies the effect of multiple energetic sources with thermal Sn on 13.5-nm reflectivity. These studies focus on conditions that simulate the EUVL source environment in a controlled way.

LPP-EUV light source for HVM lithography

NASA Astrophysics Data System (ADS)

Saito, T.; Ueno, Y.; Yabu, T.; Kurosawa, A.; Nagai, S.; Yanagida, T.; Hori, T.; Kawasuji, Y.; Abe, T.; Kodama, T.; Nakarai, H.; Yamazaki, T.; Mizoguchi, H.

2017-01-01

We have been developing a laser produced plasma extremely ultra violet (LPP-EUV) light source for a high volume manufacturing (HVM) semiconductor lithography. It has several unique technologies such as the high power short pulse carbon dioxide (CO2) laser, the short wavelength solid-state pre-pulse laser and the debris mitigation technology with the magnetic field. This paper presents the key technologies for a high power LPP-EUV light source. We also show the latest performance data which is 188W EUV power at intermediate focus (IF) point with 3.7% conversion efficiency (CE) at 100 kHz.

Studies on cryogenic Xe capillary jet target for laser-produced plasma EUV-light source

NASA Astrophysics Data System (ADS)

Inoue, T.; Nica, P. E.; Kaku, K.; Shimoura, A.; Amano, S.; Miyamoto, S.; Mochizuki, T.

2006-03-01

In this paper, characterizations of a cryogenic Xe capillary jet target for a laser-produced plasma extreme ultraviolet (EUV) light source are reported. The capillary jet target is a candidate of fast-supplying targets for mitigating debris generation and target consumption in a vacuum chamber without reducing the EUV conversion efficiency. Xe capillary jets (jet velocity ~ 0.4 m/s) were generated in vacuum by using annular nozzles chilled to ~ 170 K at a Xe backing pressure of ~ 0.7 MPa. Forming mechanisms of the capillary jet targets were studied by using numerical calculations. Furthermore, laser-produced plasma EUV generation was performed by irradiating a Nd:YAG laser (1064 nm, ~ 0.5 J, 10 ns, 120 μmφ, ~ 4×10 11 W/cm2) on a Xe capillary jet target (outer / inner diameter = 100 / 70 μmφ). The angular distribution of EUV generation was approximately uniform around the Xe capillary jet target, and the peak kinetic energy of the fast-ions was evaluated to be ~ 2 keV.

Extreme ultraviolet spectroscopy of low pressure helium microwave driven discharges

NASA Astrophysics Data System (ADS)

Espinho, Susana; Felizardo, Edgar; Tatarova, Elena; Alves, Luis Lemos

2016-09-01

Surface wave driven discharges are reliable plasma sources that can produce high levels of vacuum and extreme ultraviolet radiation (VUV and EUV). The richness of the emission spectrum makes this type of discharge a possible alternative source in EUV/VUV radiation assisted applications. However, due to challenging experimental requirements, publications concerning EUV radiation emitted by microwave plasmas are scarce and a deeper understanding of the main mechanisms governing the emission of radiation in this spectral range is required. To this end, the EUV radiation emitted by helium microwave driven plasmas operating at 2.45 GHz has been studied for low pressure conditions. Spectral lines from excited helium atoms and ions were detected via emission spectroscopy in the EUV/VUV regions. Novel data concerning the spectral lines observed in the 23 - 33 nm wavelength range and their intensity behaviour with variation of the discharge operational conditions are presented. The intensity of all the spectral emissions strongly increases with the microwave power delivered to the plasma up to 400 W. Furthermore, the intensity of all the ion spectral emissions in the EUV range decreases by nearly one order of magnitude as the pressure was raised from 0.2 to 0.5 mbar. Work funded by FCT - Fundacao para a Ciencia e a Tecnologia, under Project UID/FIS/50010/2013 and grant SFRH/BD/52412/2013 (PD-F APPLAuSE).

Spectral lines and characteristic of temporal variations in photoionized plasmas induced with laser-produced plasma extreme ultraviolet source

NASA Astrophysics Data System (ADS)

Saber, I.; Bartnik, A.; Wachulak, P.; Skrzeczanowski, W.; Jarocki, R.; Fiedorowicz, H.

2017-11-01

Spectral lines for Kr/Ne/H2 photoionized plasma in the ultraviolet and visible (UV/Vis) wavelength ranges have been created using a laser-produced plasma (LPP) EUV source. The source is based on a double-stream gas puff target irradiated with a commercial Nd:YAG laser. The laser pulses were focused onto a gas stream, injected into a vacuum chamber synchronously with the EUV pulses. Spectral lines from photoionization in neutral Kr/Ne/H2 and up to few charged states were observed. The intense emission lines were associated with the Kr transition lines. Experimental and theoretical investigations on intensity variations for some ionic lines are presented. A decrease in the intensity with the delay time between the laser pulse and the spectrum acquisition was revealed. Electron temperature and electron density in the photoionized plasma have been estimated from the characteristic emission lines. Temperature was obtained using Boltzmann plot method, assuming that the population density of atoms and ions are considered in a local thermodynamic equilibrium (LTE). Electron density was calculated from the Stark broadening profile. The temporal evaluation of the plasma and the way of optimizing the radiation intensity of LPP EUV sources is discussed.

Mask technology for EUV lithography

NASA Astrophysics Data System (ADS)

Bujak, M.; Burkhart, Scott C.; Cerjan, Charles J.; Kearney, Patrick A.; Moore, Craig E.; Prisbrey, Shon T.; Sweeney, Donald W.; Tong, William M.; Vernon, Stephen P.; Walton, Christopher C.; Warrick, Abbie L.; Weber, Frank J.; Wedowski, Marco; Wilhelmsen, Karl C.; Bokor, Jeffrey; Jeong, Sungho; Cardinale, Gregory F.; Ray-Chaudhuri, Avijit K.; Stivers, Alan R.; Tejnil, Edita; Yan, Pei-yang; Hector, Scott D.; Nguyen, Khanh B.

1999-04-01

Extreme UV Lithography (EUVL) is one of the leading candidates for the next generation lithography, which will decrease critical feature size to below 100 nm within 5 years. EUVL uses 10-14 nm light as envisioned by the EUV Limited Liability Company, a consortium formed by Intel and supported by Motorola and AMD to perform R and D work at three national laboratories. Much work has already taken place, with the first prototypical cameras operational at 13.4 nm using low energy laser plasma EUV light sources to investigate issues including the source, camera, electro- mechanical and system issues, photoresists, and of course the masks. EUV lithograph masks are fundamentally different than conventional photolithographic masks as they are reflective instead of transmissive. EUV light at 13.4 nm is rapidly absorbed by most materials, thus all light transmission within the EUVL system from source to silicon wafer, including EUV reflected from the mask, is performed by multilayer mirrors in vacuum.

EDITORIAL: Extreme Ultraviolet Light Sources for Semiconductor Manufacturing

NASA Astrophysics Data System (ADS)

Attwood, David

2004-12-01

The International Technology Roadmap for Semiconductors (ITRS) [1] provides industry expectations for high volume computer chip fabrication a decade into the future. It provides expectations to anticipated performance and requisite specifications. While the roadmap provides a collective projection of what international industry expects to produce, it does not specify the technology that will be employed. Indeed, there are generally several competing technologies for each two or three year step forward—known as `nodes'. Recent successful technologies have been based on KrF (248 nm), and now ArF (193 nm) lasers, combined with ultraviolet transmissive refractive optics, in what are known as step and scan exposure tools. Less fortunate technologies in the recent past have included soft x-ray proximity printing and, it appears, 157 nm wavelength F2 lasers. In combination with higher numerical aperture liquid emersion optics, 193 nm is expected to be used for the manufacture of leading edge chip performance for the coming five years. Beyond that, starting in about 2009, the technology to be employed is less clear. The leading candidate for the 2009 node is extreme ultraviolet (EUV) lithography, however this requires that several remaining challenges, including sufficient EUV source power, be overcome in a timely manner. This technology is based on multilayer coated reflective optics [2] and an EUV emitting plasma. Following Moore's Law [3] it is expected, for example, that at the 2009 `32 nm node' (printable patterns of 32 nm half-pitch), isolated lines with 18 nm width will be formed in resist (using threshold effects), and that these will be further narrowed to 13 nm in transfer to metalized electronic gates. These narrow features are expected to provide computer chips of 19 GHz clock frequency, with of the order of 1.5 billion transistors per chip [1]. This issue of Journal of Physics D: Applied Physics contains a cluster of eight papers addressing the critical issue of available EUV power from electrical discharge pinch plasmas and laser produced plasmas, including the roots of these requirements, the relevant plasma and radiation physics, and current state-of-the-art commercial technology. In the first paper of the cluster, Vadim Banine and Roel Moors of ASML in the Netherlands provide a detailed review of the required EUV power based on an economically viable throughput of one hundred 300 mm diameter wafers per hour, projected resist sensitivity, number of finite reflectivity multilayer coated surfaces and their collective spectral bandwidth, and a collection solid angle set by optical phase-space constraints and plasma source size. Thomas Krücken and his colleagues from Philips and the Fraunhofer Institute in Aachen present a theoretical model of radiation generation and transport based on model density and temperature profiles in an electrical discharge plasma, providing valuable insights into radiation physics and the limits to achievable power. Kenneth Fahy and his colleagues at UCD in Dublin and NIST in the US, in their paper, describe in detail atomic physics calculations of emission from relevant lines and unresolved transition arrays (UTAs) of candidate xenon and tin ions, each of which radiate strongly within the acceptance bandwidth of the multilayer coatings. The different elements, Xe and Sn, however, raise significantly different implications for source debris production and thus of requisite debris mitigation requirements. Björn Hannson and Hans Hertz of KTH University in Stockholm present a substantial review of laser produced plasmas for the EUV, including those based on liquid jet technologies, leading to a path of mass limited target material, and significant stand-off distance from the solid nozzle, which maximize EUV power generation while minimizing debris production. In addition to an extensive review of EUV source related literature, they describe experiments with laser irradiated droplets and filaments, for both Xe and Sn. The embodiment of electrical discharge plasmas and laser-produced plasmas into commercially available EUV sources, with EUV powers that project to suitable levels, is presented in the fifth paper by Uwe Stamm of XTREME Technologies in Göttingen. For discharge produced plasmas, thermal loading and electrode erosion are significant issues. Vladimir Borisov and his colleagues, at the Troitsk Institute outside Moscow, address these issues and provide novel ideas for the multiplexing of several discharge plasmas feeding a single optical system. Igor Fomenkov and his colleagues at Cymer in San Diego describe issues associated with a dense plasma focus pinch, including a comparison of operations with both positive and negative polarity. In the eighth paper, Malcolm McGeoch of Plex in Massachusetts provides a theoretical description of the vaporization and ionization of spherical tin droplets in discharge plasma. Together this cluster of papers provides a broad review of the current status of high power EUV plasma sources for semiconductor manufacturing. This very current topic, of intense interest worldwide, is considered further in a book [4] of collected papers to become available in mid-2005. Additionally, a special journal issue emphasizing coherent EUV sources, albeit at lower average powers, is soon to appear [5]. References [1] http://public.itrsr.net [2] Attwood D 2000 Soft X-Rays and Extreme Ultraviolet Radiation: Principles and Applications (Cambridge: Cambridge University Press) www.coe.Berkeley.edu/AST/sxreuv [3] Moore G E 1965 Cramming More Components onto Integrated Circuits Electronics Magazine 114 Moore G E 1995 Lithography and the Future of Moore's Law SPIE 243 2 [4] Bakshi V ed 2005 EUV Sources for Lithography (Bellingham WA:SPIE) at press [5] IEEE J. Special Topics in Quantum Electronics, Short Wavelength and EUV Lasers 10 Dec 2004 at press

Removal of Tin from Extreme Ultraviolet Collector Optics by an In-Situ Hydrogen Plasma

NASA Astrophysics Data System (ADS)

Elg, Daniel Tyler

Throughout the 1980s and 1990s, as the semiconductor industry upheld Moore's Law and continuously shrank device feature sizes, the wavelength of the lithography source remained at or below the resolution limit of the minimum feature size. Since 2001, however, the light source has been the 193nm ArF excimer laser. While the industry has managed to keep up with Moore's Law, shrinking feature sizes without shrinking the lithographic wavelength has required extra innovations and steps that increase fabrication time, cost, and error. These innovations include immersion lithography and double patterning. Currently, the industry is at the 14 nm technology node. Thus, the minimum feature size is an order of magnitude below the exposure wavelength. For the 10 nm node, triple and quadruple patterning have been proposed, causing potentially even more cost, fabrication time, and error. Such a trend cannot continue indefinitely in an economic fashion, and it is desirable to decrease the wavelength of the lithography sources. Thus, much research has been invested in extreme ultraviolet lithography (EUVL), which uses 13.5 nm light. While much progress has been made in recent years, some challenges must still be solved in order to yield a throughput high enough for EUVL to be commercially viable for high-volume manufacturing (HVM). One of these problems is collector contamination. Due to the 92 eV energy of a 13.5 nm photon, EUV light must be made by a plasma, rather than by a laser. Specifically, the industrially-favored EUV source topology is to irradiate a droplet of molten Sn with a laser, creating a dense, hot laser-produced plasma (LPP) and ionizing the Sn to (on average) the +10 state. Additionally, no materials are known to easily transmit EUV. All EUV light must be collected by a collector optic mirror, which cannot be guarded by a window. The plasmas used in EUV lithography sources expel Sn ions and neutrals, which degrade the quality of collector optics. The mitigation of this debris is one of the main problems facing potential manufacturers of EUV sources. which can damage the collector optic in three ways: sputtering, implantation, and deposition. The first two damage processes are irreversible and are caused by the high energies (1-10 keV) of the ion debris. Debris mitigation methods have largely managed to reduce this problem by using collisions with H2 buffer gas to slow down the energetic ions. However, deposition can take place at all ion and neutral energies, and no mitigation method can deterministically deflect all neutrals away from the collector. Thus, deposition still takes place, lowering the collector reflectivity and increasing the time needed to deliver enough EUV power to pattern a wafer. Additionally, even once EUV reaches HVM insertion, source power will need to be continually increased as feature sizes continue to shrink; this increase in source power may potentially come at a cost of increased debris. Thus, debris mitigation solutions that work for the initial generation of commercial EUVL systems may not be adequate for future generations. An in-situ technology to clean collector optics without source downtime is required. which will require an in-situ technology to clean collector optics. The novel cleaning solution described in this work is to create the radicals directly on the collector surface by using the collector itself to drive a capacitively-coupled hydrogen plasma. This allows for radical creation at the desired location without requiring any delivery system and without requiring any source downtime. Additionally, the plasma provides energetic radicals that aid in the etching process. This work will focus on two areas. First, it will focus on experimental collector cleaning and EUV reflectivity restoration. Second, it will focus on developing an understanding of the fundamental processes governing Sn removal. It will be shown that this plasma technique can clean an entire collector optic and restore EUV reflectivity to MLMs without damaging them. Additionally, it will be shown that, within the parameter space explored, the limiting factor in Sn etching is not hydrogen radical flux or SnH4 decomposition but ion energy flux. This will be backed up by experimental measurements, as well as a plasma chemistry model of the radical density and a 3D model of SnH4 transport and redeposition.

Recycling of laser and plasma radiation energy for enhancement of extreme ultraviolet sources for nanolithography

NASA Astrophysics Data System (ADS)

Sizyuk, V.; Sizyuk, T.; Hassanein, A.; Johnson, K.

2018-01-01

We have developed comprehensive integrated models for detailed simulation of laser-produced plasma (LPP) and laser/target interaction, with potential recycling of the escaping laser and out-of-band plasma radiation. Recycling, i.e., returning the escaping laser and plasma radiation to the extreme ultraviolet (EUV) generation region using retroreflective mirrors, has the potential of increasing the EUV conversion efficiency (CE) by up to 60% according to our simulations. This would result in significantly reduced power consumption and/or increased EUV output. Based on our recently developed models, our High Energy Interaction with General Heterogeneous Target Systems (HEIGHTS) computer simulation package was upgraded for LPP devices to include various radiation recycling regimes and to estimate the potential CE enhancement. The upgraded HEIGHTS was used to study recycling of both laser and plasma-generated radiation and to predict possible gains in conversion efficiency compared to no-recycling LPP devices when using droplets of tin target. We considered three versions of the LPP system including a single CO2 laser, a single Nd:YAG laser, and a dual-pulse device combining both laser systems. The gains in generating EUV energy were predicted and compared for these systems. Overall, laser and radiation energy recycling showed the potential for significant enhancement in source efficiency of up to 60% for the dual-pulse system. Significantly higher CE gains might be possible with optimization of the pre-pulse and main pulse parameters and source size.

EQ-10 electrodeless Z-pinch EUV source for metrology applications

NASA Astrophysics Data System (ADS)

Gustafson, Deborah; Horne, Stephen F.; Partlow, Matthew J.; Besen, Matthew M.; Smith, Donald K.; Blackborow, Paul A.

2011-11-01

With EUV Lithography systems shipping, the requirements for highly reliable EUV sources for mask inspection and resist outgassing are becoming better defined, and more urgent. The sources needed for metrology applications are very different than that needed for lithography; brightness (not power) is the key requirement. Suppliers for HVM EUV sources have all resources working on high power and have not entered the smaller market for metrology. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinchTM light source since 19951. The source is currently being used for metrology, mask inspection, and resist development2-4. These applications require especially stable performance in both output power and plasma size and position. Over the last 6 years Energetiq has made many source modifications which have included better thermal management to increase the brightness and power of the source. We now have introduced a new source that will meet requirements of some of the mask metrology first generation tools; this source will be reviewed.

Enhancement of conversion efficiency of extreme ultraviolet radiation from a liquid aqueous solution microjet target by use of dual laser pulses

NASA Astrophysics Data System (ADS)

Higashiguchi, Takeshi; Dojyo, Naoto; Hamada, Masaya; Kawasaki, Keita; Sasaki, Wataru; Kubodera, Shoichi

2006-03-01

We demonstrated a debris-free, efficient laser-produced plasma extreme ultraviolet (EUV) source by use of a regenerative liquid microjet target containing tin-dioxide (SnO II) nano-particles. By using a low SnO II concentration (6%) solution and dual laser pulses for the plasma control, we observed the EUV conversion efficiency of 1.2% with undetectable debris.

Evolution analysis of EUV radiation from laser-produced tin plasmas based on a radiation hydrodynamics model

PubMed Central

Su, M. G.; Min, Q.; Cao, S. Q.; Sun, D. X.; Hayden, P.; O’Sullivan, G.; Dong, C. Z.

2017-01-01

One of fundamental aims of extreme ultraviolet (EUV) lithography is to maximize brightness or conversion efficiency of laser energy to radiation at specific wavelengths from laser produced plasmas (LPPs) of specific elements for matching to available multilayer optical systems. Tin LPPs have been chosen for operation at a wavelength of 13.5 nm. For an investigation of EUV radiation of laser-produced tin plasmas, it is crucial to study the related atomic processes and their evolution so as to reliably predict the optimum plasma and experimental conditions. Here, we present a simplified radiation hydrodynamic model based on the fluid dynamic equations and the radiative transfer equation to rapidly investigate the evolution of radiation properties and dynamics in laser-produced tin plasmas. The self-absorption features of EUV spectra measured at an angle of 45° to the direction of plasma expansion have been successfully simulated and explained, and the evolution of some parameters, such as the plasma temperature, ion distribution and density, expansion size and velocity, have also been evaluated. Our results should be useful for further understanding of current research on extreme ultraviolet and soft X-ray source development for applications such as lithography, metrology and biological imaging. PMID:28332621

Plasma Surface Interactions Common to Advanced Fusion Wall Materials and EUV Lithography - Lithium and Tin

NASA Astrophysics Data System (ADS)

Ruzic, D. N.; Alman, D. A.; Jurczyk, B. E.; Stubbers, R.; Coventry, M. D.; Neumann, M. J.; Olczak, W.; Qiu, H.

2004-09-01

Advanced plasma facing components (PFCs) are needed to protect walls in future high power fusion devices. In the semiconductor industry, extreme ultraviolet (EUV) sources are needed for next generation lithography. Lithium and tin are candidate materials in both areas, with liquid Li and Sn plasma material interactions being critical. The Plasma Material Interaction Group at the University of Illinois is leveraging liquid metal experimental and computational facilities to benefit both fields. The Ion surface InterAction eXperiment (IIAX) has measured liquid Li and Sn sputtering, showing an enhancement in erosion with temperature for light ion bombardment. Surface Cleaning of Optics by Plasma Exposure (SCOPE) measures erosion and damage of EUV mirror samples, and tests cleaning recipes with a helicon plasma. The Flowing LIquid surface Retention Experiment (FLIRE) measures the He and H retention in flowing liquid metals, with retention coefficients varying between 0.001 at 500 eV to 0.01 at 4000 eV.

Free-electron laser emission architecture impact on extreme ultraviolet lithography

NASA Astrophysics Data System (ADS)

Hosler, Erik R.; Wood, Obert R.; Barletta, William A.

2017-10-01

Laser-produced plasma (LPP) EUV sources have demonstrated ˜125 W at customer sites, establishing confidence in EUV lithography (EUVL) as a viable manufacturing technology. However, for extension to the 3-nm technology node and beyond, existing scanner/source technology must enable higher-NA imaging systems (requiring increased resist dose and providing half-field exposures) and/or EUV multipatterning (requiring increased wafer throughput proportional to the number of exposure passes). Both development paths will require a substantial increase in EUV source power to maintain the economic viability of the technology, creating an opportunity for free-electron laser (FEL) EUV sources. FEL-based EUV sources offer an economic, high-power/single-source alternative to LPP EUV sources. Should FELs become the preferred next-generation EUV source, the choice of FEL emission architecture will greatly affect its operational stability and overall capability. A near-term industrialized FEL is expected to utilize one of the following three existing emission architectures: (1) self-amplified spontaneous emission, (2) regenerative amplifier, or (3) self-seeding. Model accelerator parameters are put forward to evaluate the impact of emission architecture on FEL output. Then, variations in the parameter space are applied to assess the potential impact to lithography operations, thereby establishing component sensitivity. The operating range of various accelerator components is discussed based on current accelerator performance demonstrated at various scientific user facilities. Finally, comparison of the performance between the model accelerator parameters and the variation in parameter space provides a means to evaluate the potential emission architectures. A scorecard is presented to facilitate this evaluation and provides a framework for future FEL design and enablement for EUVL applications.

Laser-produced plasma EUV source using a colloidal microjet target containing tin dioxide nanoparticles

NASA Astrophysics Data System (ADS)

Higashiguchi, Takeshi; Dojyo, Naoto; Sasaki, Wataru; Kubodera, Shoichi

2006-10-01

We realized a low-debris laser-produced plasma extreme ultraviolet (EUV) source by use of a colloidal microjet target, which contained low-concentration (6 wt%) tin-dioxide nanoparticles. An Nd:YAG laser was used to produce a plasma at the intensity on the order of 10^11 W/cm^2. The use of low concentration nanoparticles in a microjet target with a diameter of 50 μm regulated the neutral debris emission from a target, which was monitored by a silicon witness plate placed 30 cm apart from the source in a vacuum chamber. No XPS signals of tin and/or oxygen atoms were observed on the plate after ten thousand laser exposures. The low concentration nature of the target was compensated and the conversion efficiency (CE) was improved by introducing double pulses of two Nd:YAG lasers operated at 532 and 1064 nm as a result of controlling the micro-plasma characteristics. The EUV CE reached its maximum of 1.2% at the delay time of approximately 100 ns with the main laser intensiy of 2 x10^11 W/cm^2. The CE value was comparable to that of a tin bulk target, which, however, produced a significant amount of neutral debris.

A double-stream Xe:He jet plasma emission in the vicinity of 6.7 nm

NASA Astrophysics Data System (ADS)

Chkhalo, N. I.; Garakhin, S. A.; Golubev, S. V.; Lopatin, A. Ya.; Nechay, A. N.; Pestov, A. E.; Salashchenko, N. N.; Toropov, M. N.; Tsybin, N. N.; Vodopyanov, A. V.; Yulin, S.

2018-05-01

We present the results of investigations of extreme ultraviolet (EUV) light emission in the range from 5 to 10 nm. The light source was a pulsed "double-stream" Xe:He gas jet target irradiated by a laser beam with a power density of ˜1011 W/cm2. The radiation spectra were measured with a Czerny-Turner monochromator with a plane diffraction grating. The conversion efficiency of the laser energy into EUV radiation caused by Xe+14…+16 ion emission in the range of 6-8 nm was measured using a calibrated power meter. The conversion efficiency of the laser radiation into EUV in the vicinity of 6.7 nm was (2.17 ± 0.13)% in a 1 nm spectral band. In the spectral band of the real optical system (0.7% for La/B multilayer mirrors) emitted into the half-space, it was (0.1 ± 0.006)%. The results of this study provide an impetus for further research on laser plasma sources for maskless EUV lithography at a wavelength of 6.7 nm.

EUV near normal incidence collector development at SAGEM

NASA Astrophysics Data System (ADS)

Mercier Ythier, R.; Bozec, X.; Geyl, R.; Rinchet, A.; Hecquet, Christophe; Ravet-Krill, Marie-Françoise; Delmotte, Franck; Sassolas, Benoît; Flaminio, Raffaele; Mackowski, Jean-Marie; Michel, Christophe; Montorio, Jean-Luc; Morgado, Nazario; Pinard, Laurent; Roméo, Elodie

2008-03-01

Through its participation to European programs, SAGEM has worked on the design and manufacturing of normal incidence collectors for EUV sources. By opposition to grazing incidence, normal incidence collectors are expected to collect more light with a simpler and cheaper design. Designs are presented for the two current types of existing sources: Discharge Produced Plasma (DPP) and Laser Produced Plasma (LPP). Collection efficiency is calculated in both cases. It is shown that these collectors can achieve about 10 % efficiency for DPP sources and 40 % for LPP sources. SAGEM works on the collectors manufacturability are also presented, including polishing, coating and cooling. The feasibility of polishing has been demonstrated with a roughness better than 2 angstroms obtained on several materials (glass, silicon, Silicon Carbide, metals...). SAGEM is currently working with the Institut d'Optique and the Laboratoire des Materiaux Avancés on the design and the process of EUV coatings for large mirrors. Lastly, SAGEM has studied the design and feasibility of an efficient thermal control, based on a liquid cooling through slim channels machined close to the optical surface.

Development of a liquid tin microjet target for an efficient laser-produced plasma extreme ultraviolet source.

PubMed

Higashiguchi, Takeshi; Hamada, Masaya; Kubodera, Shoichi

2007-03-01

A regenerative tin liquid microjet target was developed for a high average power extreme ultraviolet (EUV) source. The diameter of the target was smaller than 160 microm and good vacuum lower than 0.5 Pa was maintained during the operation. A maximum EUV conversion efficiency of 1.8% at the Nd:yttrium-aluminum-garnet laser intensity of around 2 x 10(11) Wcm(2) with a spot diameter of 175 microm (full width at half maximum) was observed. The angular distribution of the EUV emission remained almost isotropic, whereas suprathermal ions mainly emerged toward the target normal.

Development of a liquid tin microjet target for an efficient laser-produced plasma extreme ultraviolet source

NASA Astrophysics Data System (ADS)

Higashiguchi, Takeshi; Hamada, Masaya; Kubodera, Shoichi

2007-03-01

A regenerative tin liquid microjet target was developed for a high average power extreme ultraviolet (EUV) source. The diameter of the target was smaller than 160 μm and good vacuum lower than 0.5 Pa was maintained during the operation. A maximum EUV conversion efficiency of 1.8% at the Nd:yttrium-aluminum-garnet laser intensity of around 2×1011 W/cm2 with a spot diameter of 175 μm (full width at half maximum) was observed. The angular distribution of the EUV emission remained almost isotropic, whereas suprathermal ions mainly emerged toward the target normal.

Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source

NASA Astrophysics Data System (ADS)

Elg, Daniel T.; Panici, Gianluca A.; Peck, Jason A.; Srivastava, Shailendra N.; Ruzic, David N.

2017-04-01

Extreme ultraviolet (EUV) lithography sources expel Sn debris. This debris deposits on the collector optic used to focus the EUV light, lowering its reflectivity and EUV throughput to the wafer. Consequently, the collector must be cleaned, causing source downtime. To solve this, a hydrogen plasma source was developed to clean the collector in situ by using the collector as an antenna to create a hydrogen plasma and create H radicals, which etch Sn as SnH4. This technique has been shown to remove Sn from a 300-mm-diameter stainless steel dummy collector. The H radical density is of key importance in Sn etching. The effects of power, pressure, and flow on radical density are explored. A catalytic probe has been used to measure radical density, and a zero-dimensional model is used to provide the fundamental science behind radical creation and predict radical densities. Model predictions and experimental measurements are in good agreement. The trends observed in radical density, contrasted with measured Sn removal rates, show that radical density is not the limiting factor in this etching system; other factors, such as SnH4 redeposition and energetic ion bombardment, must be more fully understood in order to predict removal rates.

A 1kW EUV source for lithography based on FEL emission in a compact storage ring

NASA Astrophysics Data System (ADS)

Feser, Michael; Ruth, Ron; Loewen, Rod

2017-10-01

EUV has long been hailed as the next generation lithography technology. Its adoption into high volume manufacturing (HVM), however, has been delayed several technology nodes due to technical issues, many of which can be attributed to the EUV source performance. Today's EUV lithography scanners are powered by laser produce plasma (LPP) sources. They have issues with power scaling beyond 300 W, reliability and contamination. Free Electron Lasers (FELs) have been considered as an alternative EUV source. Advantages of accelerator based sources are the maturity of the accelerator technology, lack of debris/contamination, and ability to provide high power. Industry turned away from this technology because of the requirement to feed up to 10 scanners from one linear FEL to make it economically feasible, the large footprint, and generation of radioactive byproducts. All of these issues are overcome in the presented concept using a compact storage ring with steady-state FEL lasing action. At 1 kW output power, comparable cost and footprint to an LPP source, this source is ideally suited for use on a single scanner and promises reliable, contamination free operation. FEL action in the storage ring is sustained by operating the FEL well below the saturation regime and preserving the equilibrium low emittance and energy distribution of the ring.

Prospects of DUV OoB suppression techniques in EUV lithography

NASA Astrophysics Data System (ADS)

Park, Chang-Min; Kim, Insung; Kim, Sang-Hyun; Kim, Dong-Wan; Hwang, Myung-Soo; Kang, Soon-Nam; Park, Cheolhong; Kim, Hyun-Woo; Yeo, Jeong-Ho; Kim, Seong-Sue

2014-04-01

Though scaling of source power is still the biggest challenge in EUV lithography (EUVL) technology era, CD and overlay controls for transistor's requirement are also precondition of adopting EUVL in mass production. Two kinds of contributors are identified as risks for CDU and Overlay: Infrared (IR) and deep ultraviolet (DUV) out of band (OOB) radiations from laser produced plasma (LPP) EUV source. IR from plasma generating CO2 laser that causes optics heating and wafer overlay error is well suppressed by introducing grating on collector to diffract IR off the optical axis and is the effect has been confirmed by operation of pre-production tool (NXE3100). EUV and DUV OOB which are reflected from mask black boarder (BB) are root causes of EUV-specific CD error at the boundaries of exposed shots which would result in the problem of CDU out of spec unless sufficiently suppressed. Therefore, control of DUV OOB reflection from the mask BB is one of the key technologies that must be developed prior to EUV mass production. In this paper, quantitative assessment on the advantage and the disadvantage of potential OOB solutions will be discussed. EUV and DUV OOB impacts on wafer CDs are measured from NXE3100 & NXE3300 experiments. Significant increase of DUV OOB impact on CD from NXE3300 compared with NXE3100 is observed. There are three ways of technology being developed to suppress DUV OOB: spectral purity filter (SPF) as a scanner solution, multi-layer etching as a solution on mask, and resist top-coating as a process solution. PROs and CONs of on-scanner, on-mask, and on-resist solution for the mass production of EUV lithography will be discussed.

Fabrication of nanoscale patterns in lithium fluoride crystal using a 13.5 nm Schwarzschild objective and a laser produced plasma source.

PubMed

Wang, Xin; Mu, Baozhong; Jiang, Li; Zhu, Jingtao; Yi, Shengzhen; Wang, Zhanshan; He, Pengfei

2011-12-01

Lithium fluoride (LiF) crystal is a radiation sensitive material widely used as EUV and soft x-ray detector. The LiF-based detector has high resolution, in principle limited by the point defect size, large field of view, and wide dynamic range. Using LiF crystal as an imaging detector, a resolution of 900 nm was achieved by a projection imaging of test meshes with a Schwarzschild objective operating at 13.5 nm. In addition, by imaging of a pinhole illuminated by the plasma, an EUV spot of 1.5 μm diameter in the image plane of the objective was generated, which accomplished direct writing of color centers with resolution of 800 nm. In order to avoid sample damage and contamination due to the influence of huge debris flux produced by the plasma source, a spherical normal-incidence condenser was used to collect EUV radiation. Together with a description of experimental results, the development of the Schwarzschild objective, the influence of condenser on energy density and the alignment of the imaging system are also reported.

EUV multilayer coatings for the Atmospheric Imaging Assembly instrument aboard the Solar Dynamics Observatory

DOE Office of Scientific and Technical Information (OSTI.GOV)

Soufli, R; Windt, D L; Robinson, J C

2006-02-09

Multilayer coatings for the 7 EUV channels of the AIA have been developed and completed successfully on all AIA flight mirrors. Mo/Si coatings (131, 171, 193.5, 211 {angstrom}) were deposited at Lawrence Livermore National Laboratory (LLNL). Mg/SiC (304, 335 {angstrom}) and Mo/Y (94 {angstrom}) coatings were deposited at Columbia University. EUV reflectance of the 131/335 {angstrom}, 171 {angstrom}, 193.5/211 {angstrom} primary and secondary flight mirrors and the 94/304 {angstrom} secondary flight mirror was measured at beamline 6.3.2. of the Advanced Light Source (ALS) at LBNL. EUV reflectance of the 94/304 {angstrom} primary and secondary flight mirrors was measured at beamlinemore » X24C of the National Synchrotron Light Source (NSLS) at Brookhaven National Lab. Preliminary EUV reflectance measurements of the 94, 304 and 335 {angstrom} coatings were performed with a laser plasma source reflectometer located at Columbia University. Prior to multilayer coating, Atomic Force Microscopy (AFM) characterization and cleaning of all flight substrates was performed at LLNL.« less

Characterization of gas targets for laser produced extreme ultraviolet plasmas with a Hartmann-Shack sensor

DOE Office of Scientific and Technical Information (OSTI.GOV)

Peth, Christian; Kranzusch, Sebastian; Mann, Klaus

2004-10-01

A table top extreme ultraviolet (EUV)-source was developed at Laser-Laboratorium Goettingen for the characterization of optical components and sensoric devices in the wavelength region from 11 to 13 nm. EUV radiation is generated by focusing the beam of a Q-switched Nd:YAG laser into a pulsed xenon gas jet. Since a directed gas jet with a high number density is needed for an optimal performance of the source, conical nozzles with different cone angles were drilled with an excimer laser to produce a supersonic gas jet. The influence of the nozzle geometry on the gas jet was characterized with a Hartmann-Shackmore » wave front sensor. The deformation of a planar wave front after passing the gas jet was analyzed with this sensor, allowing a reconstruction of the gas density distribution. Thus, the gas jet was optimized resulting in an increase of EUV emission by a factor of two and a decrease of the plasma size at the same time.« less

Efficient extreme ultraviolet plasma source generated by a CO2 laser and a liquid xenon microjet target

NASA Astrophysics Data System (ADS)

Ueno, Yoshifumi; Ariga, Tatsuya; Soumagne, George; Higashiguchi, Takeshi; Kubodera, Shoichi; Pogorelsky, Igor; Pavlishin, Igor; Stolyarov, Daniil; Babzien, Marcus; Kusche, Karl; Yakimenko, Vitaly

2007-05-01

We demonstrated efficacy of a CO2-laser-produced xenon plasma in the extreme ultraviolet (EUV) spectral region at 13.5nm at variable laser pulse widths between 200ps and 25ns. The plasma target was a 30μm liquid xenon microjet. To ensure the optimum coupling of CO2 laser energy with the plasma, they applied a prepulse yttrium aluminum garnet laser. The authors measured the conversion efficiency (CE) of the 13.5nm EUV emission for different pulse widths of the CO2 laser. A maximum CE of 0.6% was obtained for a CO2 laser pulse width of 25ns at an intensity of 5×1010W/cm2.

Experimental and theoretical study on emission spectra of a nitrogen photoionized plasma induced by intense EUV pulses

NASA Astrophysics Data System (ADS)

Saber, Ismail; Bartnik, Andrzej; Skrzeczanowski, Wojciech; Wachulak, Przemyslaw; Jarocki, Roman; Fiedorowicz, Henryk; Limpouch, Jiri

2018-01-01

Spectral lines of low-temperature nitrogen photoionized plasma were investigated. The photoionized plasma was created in the result of irradiation N2 gas using laser plasma EUV radiation pulses. The source was based on a 10J/10ns Nd:YAG (λ = 1064 nm) laser system and a gas puff target. The EUV radiation pulses were collected and focused using a grazing incidence multifoil EUV collector. The emission spectra were measured in the ultraviolet and visible (UV/Vis) range. It was found that the plasma emission lines in the lower region of the UV range are relativley weak. Nonetheless, a part of the spectra contains strong molecular band in the 300 - 430 nm originated from second positive and first negative systems band transitions of nitrogen. These molecular band transitions were identified using a code for study the diatomic molecules, LIFBASE. The vibrational band of Δv = 0 and ±1 transitions were significantly populated than of that with Δv = ±2 and 3 transitions. A comparison of the calculated and measured spectrum is presented. With an assumption of a local thermodynamic equilibrium (LTE), the vibrational temperature was determined from the integrated band intensities with the help of the Boltzmann plot method and compared to the temperature predicted by SPECAIR and LIFBASE simulations. A summary of the results and the variations in the vibrational temperatures was discussed.

Microfabrication of through holes in polydimethylsiloxane (PDMS) sheets using a laser plasma EUV source (Conference Presentation)

NASA Astrophysics Data System (ADS)

Makimura, Tetsuya; Urai, Hikari; Niino, Hiroyuki

2017-03-01

Polydimethylsiloxane (PDMS) is a material used for cell culture substrates / bio-chips and micro total analysis systems / lab-on-chips due to its flexibility, chemical / thermo-dynamic stability, bio-compatibility, transparency and moldability. For further development, it is inevitable to develop a technique to fabricate precise three dimensional structures on micrometer-scale at high aspect ratio. In the previous works, we reported a technique for high-quality micromachining of PDMS without chemical modification, by means of photo direct machining using laser plasma EUV sources. In the present work, we have investigated fabrication of through holes. The EUV radiations around 10 nm were generated by irradiation of Ta targets with Nd:YAG laser light (10 ns, 500 mJ/pulse). The generated EUV radiations were focused using an ellipsoidal mirror. It has a narrower incident angle than those in the previous works in order to form a EUV beam with higher directivity, so that higher aspect structures can be fabricated. The focused EUV beam was incident on PDMS sheets with a thickness of 15 micrometers, through holes in a contact mask placed on top of them. Using a contact mask with holes with a diameter of three micrometers, complete through holes with a diameter of two micrometers are fabricated in the PDMS sheet. Using a contact mask with two micrometer holes, however, ablation holes almost reaches to the back side of the PDMS sheet. The fabricated structures can be explained in terms of geometrical optics. Thus, we have developed a technique for micromachining of PDMS sheets at high aspect ratios.

Performance of 100-W HVM LPP-EUV source

NASA Astrophysics Data System (ADS)

Mizoguchi, Hakaru; Nakarai, Hiroaki; Abe, Tamotsu; Nowak, Krzysztof M.; Kawasuji, Yasufumi; Tanaka, Hiroshi; Watanabe, Yukio; Hori, Tsukasa; Kodama, Takeshi; Shiraishi, Yutaka; Yanagida, Tatsuya; Soumagne, Georg; Yamada, Tsuyoshi; Yamazaki, Taku; Okazaki, Shinji; Saitou, Takashi

2015-08-01

At Gigaphoton Inc., we have developed unique and original technologies for a carbon dioxide laser-produced tin plasma extreme ultraviolet (CO2-Sn-LPP EUV) light source, which is the most promising solution for high-power high-volume manufacturing (HVM) EUV lithography at 13.5 nm. Our unique technologies include the combination of a pulsed CO2 laser with Sn droplets, the application of dual-wavelength laser pulses for Sn droplet conditioning, and subsequent EUV generation and magnetic field mitigation. Theoretical and experimental data have clearly shown the advantage of our proposed strategy. Currently, we are developing the first HVM light source, `GL200E'. This HVM light source will provide 250-W EUV power based on a 20-kW level pulsed CO2 laser. The preparation of a high average-power CO2 laser (more than 20 kW output power) has been completed in cooperation with Mitsubishi Electric Corporation. Recently, we achieved 140 W at 50 kHz and 50% duty cycle operation as well as 2 h of operation at 100 W of power level. Further improvements are ongoing. We will report the latest status and the challenge to reach stable system operation of more than 100 W at about 4% conversion efficiency with 20-μm droplets and magnetic mitigation.

Ionising sources in the coma of 67P probed by Rosetta

NASA Astrophysics Data System (ADS)

Heritier, Kevin; Galand, Marina; Henri, Pierre; Eriksson, Anders; Odelstad, Elias; Altwegg, Kathrin; Beth, Arnaud; Broiles, Thomas; Burch, Jim; Carr, Christopher; Cupido, Emanuele; Glassmeier, Karl-Heinz; Nilsson, Hans; Richter, Ingo; Rubin, Martin; Vallieres, Xavier; Vigren, Erik

2017-04-01

An ionospheric model has been developed in order to quantify the ion number density in the coma of 67P/Churyumov-Gerasimenko. The model is driven by Rosetta Orbiter Spectrometer for Ion and Neutral Analysis (ROSINA)/Cometary Pressure Sensor (COPS) neutral density and assumes isentropic expansion for the neutral density profile. The two ionisation sources considered are photo-ionisation by solar extreme ultraviolet (EUV) radiation and electron-impact ionisation. The EUV radiation is estimated from fluxes measured by the Thermosphere Ionosphere Mesosphere Energetics and Dynamics (TIMED)/ Solar EUV Experiment (SEE), taking into account the phase shift and the heliocentric distance ratio; between Earth and comet 67P. The electron-impact ionisation production rates are derived from Rosetta Plasma Consortium (RPC)-Ion and Electron Sensor (IES) integrated electron fluxes and corrected for the S/C potential from RPC/LAngmuir Probe (LAP) measurements. Our results are compared with in situ measurements of the plasma density from RPC-Mutual Impedance Probe (MIP) and RPC-LAP. There is a good agreement between the modelled and RPC observed electron densities. The ionospheric model enables to distinguish the relative contributions of the different sources to the total cometary plasma. At high heliocentric distances, electron-impact ionisation becomes the dominant ionisation source and is enhanced over the winter hemisphere. As the solar activity has decreased since the beginning of the mission in 2014, the relative importance of photo-ionisation has decreased as well. However, at low heliocentric distances, photo-ionisation seems to be the most dominant ionising source, in particular through the perihelion period in summer 2015.

It's Time For A New EUV Mission

NASA Astrophysics Data System (ADS)

Kowalski, Michael Paul; Wood, K. S.; Barstow, M. A.; Cruddace, R. G.

2010-01-01

The J-PEX high-resolution EUV spectrometer has made a breakthrough in capability with an effective area of 7 cm2 (220-245 Å) and resolving power of 4000, which exceed EUVE by factors of 7 and 20 respectively, and cover a range beyond the 170-Å cutoff of the Chandra LETG. The EUV includes critical spectral features containing diagnostic information often not available at other wavelengths (e.g., He II Ly series), and the bulk of radiation from million degree plasmas is emitted in the EUV. Such plasmas are ubiquitous, and examples include the atmospheres of white dwarfs; accretion phenomena in young stars, CVs and AGN; stellar coronae; and the ISM of our own galaxy and of others. However, sensitive EUV spectroscopy of high resolving power is required to resolve source spectral lines and edges unambiguously, to identify features produced by the intervening ISM, and to measure line profiles and Doppler shifts. This allows exploitation of the full range of plasma diagnostic techniques developed in laboratory and solar physics. J-PEX has flown twice on NASA sounding rockets. In 2001 we observed the isolated white dwarf G191-B2B and detected both ISM and photospheric lines. In 2008 we successfully observed the binary white dwarf Feige 24, but observation time is severely limited with sounding rockets. NASA has approved no new EUV mission, but it is time for one. Here we describe the scientific case for high-resolution EUV spectroscopy, summarize the technology that makes such measurements practical, and present a concept for a 3-month orbital mission, in which J-PEX is modified for a low-cost orbital mission to acquire sensitive high-resolution spectra for 30 white dwarfs, making an important contribution to the study of white dwarf evolution and hence the chemical balance of the Galaxy, and to the understanding of structure in the LISM.

EUV spectroscopy in astrophysics: The role of compact objects

NASA Astrophysics Data System (ADS)

Wood, K. S.; Kowalski, M. P.; Cruddace, R. G.; Barstow, M. A.

2006-01-01

The bulk of radiation from million-degree plasmas is emitted at EUV wavelengths. Such plasmas are ubiquitous in astrophysics, and examples include the atmospheres of white dwarfs, accretion phenomena in cataclysmic variables (CVs) and some active galactic nuclei (AGN), the coronae of active stars, and the interstellar medium (ISM) of our own galaxy as well as of others. Internally, white dwarfs are formally analogous to neutron stars, being stellar configurations where the thermal contribution to support is secondary. Both stellar types have various intrinsic and environmental parameters. Comparison of such analogous systems using scaled parameters can be fruitful. Source class characterization is mature enough that such analogies can be used to compare theoretical ideas across a wide dynamic range in parameters, one example being theories of quasiperiodic oscillations. However, the white dwarf side of this program is limited by the available photometry and spectroscopy at EUV wavelengths, where there exist critical spectral features that contain diagnostic information often not available at other wavelengths. Moreover, interstellar absorption makes EUV observations challenging. Results from an observation of the hot white dwarf G191-B2B are presented to demonstrate the promise of high-resolution EUV spectroscopy. Two types of CVs, exemplified by AM Her and EX Hya, are used to illustrate blending of spectroscopy and timing measurements. Dynamical timescales and envisioned performance parameters of next-generation EUV satellites (effective area >20 cm 2, spectral resolution >10,000) make possible a new level of source modeling. The importance of the EUV cannot be overlooked given that observations are continually being pushed to cosmological distances, where the spectral energy distributions of X-ray bright AGNs, for example, will have their maxima redshifted into the EUV. Sometimes wrongly dismissed for limitations of small bandwidth or local view from optical depth limitations, the EUV is instead a gold mine of information bearing upon key issues in compact objects, but it is information that must be won through the triple combination of high-spectral resolution, large area, and application of advanced theory.

Response of inorganic materials to laser - plasma EUV radiation focused with a lobster eye collector

NASA Astrophysics Data System (ADS)

Bartnik, Andrzej; Fiedorowicz, Henryk; Jarocki, Roman; Kostecki, Jerzy; Szczurek, Miroslaw; Havlikova, Radka; Pína, Ladislav; Švéda, Libor; Inneman, Adolf

2007-05-01

A single photon of EUV radiation carries enough energy to break any chemical bond or excite electrons from inner atomic shells. It means that the radiation regardless of its intensity can modify chemical structure of molecules. It is the reason that the radiation even with low intensity can cause fragmentation of long chains of organic materials and desorption of small parts from their surface. In this work interaction of EUV radiation with inorganic materials was investigated. Different inorganic samples were irradiated with a 10 Hz laser - plasma EUV source based on a gas puff target. The radiation was focused on a sample surface using a lobster eye collector. Radiation fluence at the surface reached 30 mJ/cm2 within a wavelength range 7 - 20 nm. In most cases there was no surface damage even after several minutes of irradiation. In some cases there could be noticed discolouration of an irradiated surface or evidences of thermal effects. In most cases however luminescent and scattered radiation was observed. The luminescent radiation was emitted in different wavelength ranges. It was recorded in a visible range of radiation and also in a wide wavelength range including UV, VUV and EUV. The radiation was especially intense in a case of non-metallic chemical compounds.

High-resolution measurements in the EUV on NSTX

NASA Astrophysics Data System (ADS)

Beiersdorfer, P.; Bitter, M.; Lepson, J. K.; Gu, M.-F.

2005-10-01

The extreme ultraviolet (EUV) wavelength band is rich in lines useful as plasma diagnostics. This fact is being used by the Chandra and XMM-Newton satellites for studying stellar coronae and galactic nuclei. We have installed a new grating spectrometer on the NSTX tokamak that allows us to study emission lines in the EUV with similar spectral resolution. We have observed the K-shell lines of heliumlike and hydrogenlike boron, carbon, and oxygen. Moreover, we have measured the L-shell spectra of neonlike Ar, Fe, and Ni. All elements except argon were intrinsic to NSTX plasmas. Many of these spectra are of great interest to astrophysics. Our measurements provide line lists and calibrate density-sensitive line ratios in a density regime not accessible by other laboratory sources. Moreover, we were able to measure the temperature dependence of several iron lines needed to address puzzling results from stellar flare plasmas. This work was performed under the auspices of the U.S. DOE by UC-LLNL under contract W-7405-Eng-48 and by PPPL under contract DE-AC02-76CHO3073.

Soft x-ray imaging with incoherent sources

NASA Astrophysics Data System (ADS)

Wachulak, P.; Torrisi, A.; Ayele, M.; Bartnik, A.; Czwartos, J.; Wegrzyński, Ł.; Fok, T.; Parkman, T.; Vondrová, Š.; Turnová, J.; Odstrcil, M.; Fiedorowicz, H.

2017-05-01

In this work we present experimental, compact desk-top SXR microscope, the EUV microscope which is at this stage a technology demonstrator, and finally, the SXR contact microscope. The systems are based on laser-plasma EUV and SXR sources, employing a double stream gas puff target. The EUV and SXR full field microscopes, operating at 13.8 nm and 2.88 nm wavelengths, respectively, are capable of imaging nanostructures with a sub-50 nm spatial resolution with relatively short (seconds) exposure times. The SXR contact microscope operates in the "water-window" spectral range, to produce an imprint of the internal structure of the sample in a thin layer of SXR light sensitive photoresist. Applications of such desk-top EUV and SXR microscopes for studies of variety of different samples - test objects for resolution assessment and other objects such as carbon membranes, DNA plasmid samples, organic and inorganic thin layers, diatoms, algae and carcinoma cells, are also presented. Details about the sources, the microscopes as well as the imaging results for various objects will be presented and discussed. The development of such compact imaging systems may be important to the new research related to biological, material science and nanotechnology applications.

Wall Conditioning Characterization in NSTX-U

NASA Astrophysics Data System (ADS)

Caron, D.; Soukhanovskii, V.; Scotti, F.; Weller, M.

2016-10-01

Impurities in tokamak plasmas can lead to disruptive instabilities due to radiative energy loss which impede access to high-confinements mode. One source of impurities in NSTX-U are water molecules trapped in graphite plasma facing components (PFCs), which make up the walls and divertors. Hydrogen and oxygen impurities are released into the plasma due to plasma surface interactions. Extreme ultraviolet (EUV) and visible spectrometers are used in conjunction with a residual gas analyzer (RGA) to characterize the source and amount of released impurities. A high resolution visible spectrometer measured H/D Balmer- α intensity ratio on the inner wall, the upper and lower divertors, and provided a hydrogen time history for shot-to-shot trends. The RGA provided partial pressure trends of masses 2 (H2) , 16 (O2) , and 18 (H2O). Trends of O VIII and C VI spectral line intensities from the core plasma were obtained from the EUV spectrometer. The trends are correlated with wall conditioning, namely helium glow discharge cleaning and boronization. Using these trends, impurity content monitoring and recommendations for wall conditioning can be implemented. Work supported by DOE under Contracts DE-AC52-07NA27344 and DE-AC02-09CH11466.

Spherical EUV and Plasma Spectrometer (seps) -a Monitor to Measure the Plasma and EUV Environment in Space

NASA Astrophysics Data System (ADS)

Brunner, Raimund; Schmidtke, Gerhard; Konz, Werner; Pfeffer, Wilfried

A low-cost monitor to measure the EUV and plasma environment in space is presented. The device consists of three (or more) isolated spheres, a metallic sphere, one or more highly trans-parent Inner Grids and Outer Grids. Each one is being connected to a sensitive floating elec-trometer. By setting different potentials to the grids as well as to the sphere and varying one or more of their voltages, measurements of spectral solar EUV irradiance (15-200 nm), of local plasma parameters such as electron and ion densities, electron energies and temperatures as well as ion compositions and debris events can be derived from the current recordings. This detector does not require any (solar) pointing device. The primary goal is to study the impact of solar activity events (e.g. CMEs) as well as subsequent reactions of the ionospheric/thermospheric systems (including space weather occurences). The capability of SEPS for measuring EUV pho-ton fluxes as well as plasma parameters in the energy range from 0 to +/-70 eV is demonstrated by laboratory measurements as performed in the IPM laboratory, at BESSY-PTB electron syn-chrotron in Berlin and at ESA/ESTEC plasma chamber. Based on the laboratory recording of plasma recombination EUV emission the sensor is suitable to detect also auroral and airglow radiations. -The state of the art in the development of this device is reported.

CO2 laser drives extreme ultraviolet nano-lithography — second life of mature laser technology

NASA Astrophysics Data System (ADS)

Nowak, K. M.; Ohta, T.; Suganuma, T.; Fujimoto, J.; Mizoguchi, H.; Sumitani, A.; Endo, A.

2013-12-01

It was shown both theoretically and experimentally that nanosecond order laser pulses at 10.6 micron wavelength were superior for driving the Sn plasma extreme ultraviolet (EUV) source for nano-lithography for the reasons of higher conversion efficiency, lower production of debris and higher average power levels obtainable in CO2 media without serious problems of beam distortions and nonlinear effects occurring in competing solid-state lasers at high intensities. The renewed interest in such pulse format, wavelength, repetition rates in excess of 50 kHz and average power levels in excess of 18 kiloWatt has sparked new opportunities for a matured multi-kiloWatt CO2 laser technology. The power demand of EUV source could be only satisfied by a Master-Oscillator-Power-Amplifier system configuration, leading to a development of a new type of hybrid pulsed CO2 laser employing a whole spectrum of CO2 technology, such as fast flow systems and diffusion-cooled planar waveguide lasers, and relatively recent quantum cascade lasers. In this paper we review briefly the history of relevant pulsed CO2 laser technology and the requirements for multi-kiloWatt CO2 laser, intended for the laser-produced plasma EUV source, and present our recent advances, such as novel solid-state seeded master oscillator and efficient multi-pass amplifiers built on planar waveguide CO2 lasers.

Mechanism of soft x-ray continuum radiation from low-energy pinch discharges of hydrogen and ultra-low field ignition of solid fuels

NASA Astrophysics Data System (ADS)

Mills, R.; Lotoski, J.; Lu, Y.

2017-09-01

EUV continuum radiation (10-30 nm) arising only from very low energy pulsed pinch gas discharges comprising some hydrogen was first observed at BlackLight Power, Inc. and reproduced at the Harvard Center for Astrophysics (CfA). The source was determined to be due to the transition of H to the lower-energy hydrogen or hydrino state H(1/4) whose emission matches that observed wherein alternative sources were eliminated. The identity of the catalyst that accepts 3 · 27.2 eV from the H to cause the H to H(1/4) transition was determined to HOH versus 3H. The mechanism was elucidated using different oxide-coated electrodes that were selective in forming HOH versus plasma forming metal atoms as well as from the intensity profile that was a mismatch for the multi-body reaction required during 3H catalysis. The HOH catalyst was further shown to give EUV radiation of the same nature by igniting a solid fuel comprising a source of H and HOH catalyst by passing a low voltage, high current through the fuel to produce explosive plasma. No chemical reaction can release such high-energy light. No high field existed to form highly ionized ions that could give radiation in this EUV region that persisted even without power input. This plasma source serves as strong evidence for the existence of the transition of H to hydrino H(1/4) by HOH as the catalyst and a corresponding new power source wherein initial extraordinarily brilliant light-emitting prototypes are already producing photovoltaic generated electrical power. The hydrino product of a catalyst reaction of atomic hydrogen was analyzed by multiple spectroscopic techniques. Moreover, the mH catalyst was identified to be active in astronomical sources such as the Sun, stars and interstellar medium wherein the characteristics of hydrino match those of the dark matter of the Universe.

Efficient extreme-UV-to-extreme-UV conversion by four-wave mixing with intense near-IR pulses in highly charged ion plasmas

NASA Astrophysics Data System (ADS)

Chu, Hsu-hsin; Wang, Jyhpyng

2018-05-01

Nonlinear optics in the extreme-ultraviolet (EUV) has been limited by lack of transparent media and small conversion efficiency. To overcome this problem we explore the advantage of using multiply charged ion plasmas as the interacting media between EUV and intense near-infrared (NIR) pulses. Such media are transparent to EUV and can withstand intense NIR driving pulses without damage. We calculate the third-order nonlinear polarizabilities of Ar2 + and Ar3 + ions for EUV and NIR four-wave mixing by using the well-proven Cowan code and find that the EUV-to-EUV conversion efficiency as high as 26% can be expected for practical experimental configurations using multi-terawatt NIR lasers. Such a high efficiency is possible because the driving pulse intensity can be scaled up to several orders of magnitude higher than in conventional nonlinear media, and the group-velocity and phase mismatch are insignificant at the experimental plasma densities. This effective scheme of wave mixing can be utilized for ultrafast EUV waveform measurement and control as well as wavelength conversion.

The creation of radiation dominated plasmas using laboratory extreme ultra-violet lasers

NASA Astrophysics Data System (ADS)

Tallents, G. J.; Wilson, S.; West, A.; Aslanyan, V.; Lolley, J.; Rossall, A. K.

2017-06-01

Ionization in experiments where solid targets are irradiated by high irradiance extreme ultra-violet (EUV) lasers is examined. Free electron degeneracy effects on ionization in the presence of a high EUV flux of radiation is shown to be important. Overlap of the physics of such plasmas with plasma material under compression in indirect inertial fusion is explored. The design of the focusing optics needed to achieve high irradiance (up to 1014 Wcm-2) using an EUV capillary laser is presented.

A sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution

DOE PAGES

Zastrau, U.; Rodel, C.; Nakatsutsumi, M.; ...

2018-02-05

We present an extreme ultraviolet (EUV) microscope using a Schwarzschild objective which is optimized for single-shot sub-micrometer imaging of laser-plasma targets. The microscope has been designed and constructed for imaging the scattering from an EUV-heated solid-density hydrogen jet. Here, imaging of a cryogenic hydrogen target was demonstrated using single pulses of the free-electron laser in Hamburg (FLASH) free-electron laser at a wavelength of 13.5 nm. In a single exposure, we observe a hydrogen jet with ice fragments with a spatial resolution in the sub-micrometer range. In situ EUV imaging is expected to enable novel experimental capabilities for warm dense mattermore » studies of micrometer-sized samples in laser-plasma experiments.« less

A sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zastrau, U.; Rodel, C.; Nakatsutsumi, M.

We present an extreme ultraviolet (EUV) microscope using a Schwarzschild objective which is optimized for single-shot sub-micrometer imaging of laser-plasma targets. The microscope has been designed and constructed for imaging the scattering from an EUV-heated solid-density hydrogen jet. Here, imaging of a cryogenic hydrogen target was demonstrated using single pulses of the free-electron laser in Hamburg (FLASH) free-electron laser at a wavelength of 13.5 nm. In a single exposure, we observe a hydrogen jet with ice fragments with a spatial resolution in the sub-micrometer range. In situ EUV imaging is expected to enable novel experimental capabilities for warm dense mattermore » studies of micrometer-sized samples in laser-plasma experiments.« less

Synthesis of arbitrary pulse waveforms in QCL-seeded ns-pulse CO₂ laser for optimization of an LPP EUV source.

PubMed

Nowak, Krzysztof M; Kurosawa, Yoshiaki; Suganuma, Takashi; Kawasuji, Yasufumi; Nakarai, Hiroaki; Saito, Takashi; Fujimoto, Junichi; Mizoguchi, Hakaru

2016-07-01

One of the unique features of the quantum-cascade-laser-seeded, nanosecond-pulse CO₂ laser, invented for the purpose of generation of extreme UV by laser-produced-plasma, is a robust synthesis of arbitrary pulse waveforms. In the present Letter we report on experimental results that are, to our best knowledge, the first demonstration of such functionality obtainable from nanosecond-pulse CO₂ laser technology. An online pulse duration adjustment within 10-40 ns was demonstrated, and a few exemplary pulse waveforms were synthesized, such as "tophat," "tailspike," and "leadspike" shapes. Such output characteristics may be useful to optimize the performance of LPP EUV source.

Serendipitous EUV sources detected during the first year of the Extreme Ultraviolet Explorer right angle program

NASA Technical Reports Server (NTRS)

Mcdonald, K.; Craig, N.; Sirk, M. M.; Drake, J. J.; Fruscione, A.; Vallerga, J. V.; Malina, R. F.

1994-01-01

We report the detection of 114 extreme ultraviolet (EUV; 58 - 740 A) sources, of which 99 are new serendipitous sources, based on observations made with the imaging telescopes on board the Extreme Ultraviolet Explorer (EUVE) during the Right Angle Program (RAP). These data were obtained using the survey scanners and the Deep Survey instrument during the first year of the spectroscopic guest observer phase of the mission, from January 1993 to January 1994. The data set consists of 162 discrete pointings whose exposure times are typically two orders of magnitude longer than the average exposure times during the EUVE all-sky survey. Based on these results, we can expect that EUVE will serendipitously detect approximately 100 new EUV sources per year, or about one new EUV source per 10 sq deg, during the guest observer phase of the EUVE mission. New EUVE sources of note include one B star and three extragalactic objects. The B star (HR 2875, EUVE J0729 - 38.7) is detected in both the Lexan/B (approximately 100 A) and Al/Ti/C (approximately 200 A) bandpasses, and the detection is shown not to be a result of UV leaks. We suggest that we are detecting EUV and/or soft x rays from a companion to the B star. Three sources, EUVE J2132+10.1, EUVE J2343-14.9, and EUVE J2359-30.6 are identified as the active galactic nuclei MKN 1513, MS2340.9-1511, and 1H2354-315, respectively.

Hot interstellar gas and ionization of embedded clouds

NASA Technical Reports Server (NTRS)

Cheng, K.-P.; Bruhweiler, F.

1990-01-01

Researchers present detailed photoionization calculations for the instellar cloud in which the Sun is embedded. They consider the EUV radiation field with contribution from discrete stellar sources and from a thermal bremsstrahlung-radiative recombination spectrum emitted from the surrounding 10 to the 6th power k coronal substrate. They establish lower limits to the fractional ionization of hydrogen and helium of 0.17 and 0.29 respectively. The high He ionization fraction results primarily from very strong line emission below 500 A originating in the surrounding coronal substrate while the H ionization is dominated by the EUV radiation from the discrete stellar sources. The dual effects of thermal conduction and the EUV spectrum of the 10 to the 6th k plasma on ionization in the cloud skin are explored. The EUV radiation field and Auger ionization have insignificant effects on the resulting ionic column densities of Si IV, C IV, N V and O VI through the cloud skin. Calculations show that the abundances of these species are dominated by collisional ionization in the thermal conduction front. Because of a low charge exchange rate with hydrogen, the ionic column density ratios of N (CIII)/N (CII) and N (NII)/N (NI) are dominated by the EUV radiation field in the local interstellar medium. These ratios should be important diagnostics for the EUV radiation field and serve as surrogate indicators of the interstellar He and H ionization fraction respectively. Spacecraft such as Lyman which is designed to obtain high resolution spectral data down to the Lyman limit at 912 A could sample interstellar lines of these ions.

Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

DOEpatents

Kublak, G.D.; Richardson, M.C.

1996-11-19

Method and apparatus for producing extreme ultraviolet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10{sup 11}--10{sup 12} watts/cm{sup 2}) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10--30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle. 5 figs.

Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

DOEpatents

Kublak, Glenn D.; Richardson, Martin C. (CREOL

1996-01-01

Method and apparatus for producing extreme ultra violet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10.sup.11 -10.sup.12 watts/cm.sup.2) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10-30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle.

Overcoming etch challenges related to EUV based patterning (Conference Presentation)

NASA Astrophysics Data System (ADS)

Metz, Andrew W.; Cottle, Hongyun; Honda, Masanobu; Morikita, Shinya; Kumar, Kaushik A.; Biolsi, Peter

2017-04-01

Research and development activities related to Extreme Ultra Violet [EUV] defined patterning continue to grow for < 40 nm pitch applications. The confluence of high cost and extreme process control challenges of Self-Aligned Quad Patterning [SAQP] with continued momentum for EUV ecosystem readiness could provide cost advantages in addition to improved intra-level overlay performance relative to multiple patterning approaches. However, Line Edge Roughness [LER] and Line Width Roughness [LWR] performance of EUV defined resist images are still far from meeting technology needs or ITRS spec performance. Furthermore, extreme resist height scaling to mitigate flop over exacerbates the plasma etch trade-offs related to traditional approaches of PR smoothing, descum implementation and maintaining 2D aspect ratios of short lines or elliptical contacts concurrent with ultra-high photo resist [PR] selectivity. In this paper we will discuss sources of LER/LWR, impact of material choice, integration, and innovative plasma process techniques and describe how TELTM VigusTM CCP Etchers can enhance PR selectivity, reduce LER/LWR, and maintain 2D aspect ratio of incoming patterns. Beyond traditional process approaches this paper will show the utility of: [1] DC Superposition in enhancing EUV resist hardening and selectivity, increasing resistance to stress induced PR line wiggle caused by CFx passivation, and mitigating organic planarizer wiggle; [2] Quasi Atomic Layer Etch [Q-ALE] for ARC open eliminating the tradeoffs between selectivity, CD, and shrink ratio control; and [3] ALD+Etch FUSION technology for feature independent CD shrink and LER reduction. Applicability of these concepts back transferred to 193i based lithography is also confirmed.

Development of extreme ultraviolet and soft x-ray multilayer optics for scientific studies with femtosecond/attosecond sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Aquila, Andrew Lee

The development of multilayer optics for extreme ultraviolet (EUV) radiation has led to advancements in many areas of science and technology, including materials studies, EUV lithography, water window microscopy, plasma imaging, and orbiting solar physics imaging. Recent developments in femtosecond and attosecond EUV pulse generation from sources such as high harmonic generation lasers, combined with the elemental and chemical specificity provided by EUV radiation, are opening new opportunities to study fundamental dynamic processes in materials. Critical to these efforts is the design and fabrication of multilayer optics to transport, focus, shape and image these ultra-fast pulses This thesis describes themore » design, fabrication, characterization, and application of multilayer optics for EUV femtosecond and attosecond scientific studies. Multilayer mirrors for bandwidth control, pulse shaping and compression, tri-material multilayers, and multilayers for polarization control are described. Characterization of multilayer optics, including measurement of material optical constants, reflectivity of multilayer mirrors, and metrology of reflected phases of the multilayer, which is critical to maintaining pulse size and shape, were performed. Two applications of these multilayer mirrors are detailed in the thesis. In the first application, broad bandwidth multilayers were used to characterize and measure sub-100 attosecond pulses from a high harmonic generation source and was performed in collaboration with the Max-Planck institute for Quantum Optics and Ludwig- Maximilians University in Garching, Germany, with Professors Krausz and Kleineberg. In the second application, multilayer mirrors with polarization control are useful to study femtosecond spin dynamics in an ongoing collaboration with the T-REX group of Professor Parmigiani at Elettra in Trieste, Italy. As new ultrafast x-ray sources become available, for example free electron lasers, the multilayer designs described in this thesis can be extended to higher photon energies, and such designs can be used with those sources to enable new scientific studies, such as molecular bonding, phonon, and spin dynamics.« less

Estimation of optimum density and temperature for maximum efficiency of tin ions in Z discharge extreme ultraviolet sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Masnavi, Majid; Nakajima, Mitsuo; Hotta, Eiki

Extreme ultraviolet (EUV) discharge-based lamps for EUV lithography need to generate extremely high power in the narrow spectrum band of 13.5{+-}0.135 nm. A simplified collisional-radiative model and radiative transfer solution for an isotropic medium were utilized to investigate the wavelength-integrated light outputs in tin (Sn) plasma. Detailed calculations using the Hebrew University-Lawrence Livermore atomic code were employed for determination of necessary atomic data of the Sn{sup 4+} to Sn{sup 13+} charge states. The result of model is compared with experimental spectra from a Sn-based discharge-produced plasma. The analysis reveals that considerably larger efficiency compared to the so-called efficiency of amore » black-body radiator is formed for the electron density {approx_equal}10{sup 18} cm{sup -3}. For higher electron density, the spectral efficiency of Sn plasma reduces due to the saturation of resonance transitions.« less

Enhancement of EUV emission from a liquid microjet target by use of dual laser pulses

NASA Astrophysics Data System (ADS)

Higashiguchi, Takeshi; Rajyaguru, Chirag; Koga, Masato; Kawasaki, Keita; Sasaki, Wataru; Kubodera, Shoichi; Kikuchi, Takashi; Yugami, Noboru; Kawata, Shigeo; Andreev, Alexander A.

2005-03-01

Extreme ultraviolet (EUV) radiation at the wavelength of around 13nm waws observed from a laser-produced plasma using continuous water-jet. Strong dependence of the conversion efficiency (CE) on the laser focal spot size and jet diameter was observed. The EUV CE at a given laser spot size and jet diameter was further enhanced using double laser pulses, where a pre-pulse was used for initial heating of the plasma.

Physical properties of erupting plasma associated with coronal mass ejections

NASA Astrophysics Data System (ADS)

Lee, J.; Raymond, J. C.; Reeves, K. K.; Moon, Y.; Kim, K.

2013-12-01

We investigate the physical properties (temperature, density, and mass) of erupting plasma observed in X-rays and EUV, which are all associated with coronal mass ejections observed by SOHO/LASCO. The erupting plasmas are observed as absorption or emission features in the low corona. The absorption feature provides a lower limit to the cold mass while the emission feature provides an upper limit to the mass of observed plasma in X-ray and EUV. We compare the mass constraints for each temperature response and find that the mass estimates in EUV and XRT are smaller than the total mass in the coronagraph. Several events were observed by a few passbands in the X-rays, which allows us to determine the temperature of the eruptive plasma using a filter ratio method. The temperature of one event is estimated at about 8.6 MK near the top of the erupting plasma. This measurement is possibly an average temperature for higher temperature plasma because the XRT is more sensitive at higher temperatures. In addition, a few events show that the absorption features of a prominence or a loop change to emission features with the beginning of their eruptions in all EUV wavelengths of SDO/AIA, which indicates the heating of the plasma. By estimating the physical properties of the erupting plasmas, we discuss the heating of the plasmas associated with coronal mass ejections in the low corona.

Ionization in the local interstellar and intergalactic media

DOE Office of Scientific and Technical Information (OSTI.GOV)

Cheng, K.

1990-01-01

Detailed photoionization calculations for the local interstellar medium (LISM) and the intergalactic medium (IGM) are presented. Constraints in the LISM are imposed by H I column density derived from IUE and Copernicus data toward nearby B stars and hot white dwarfs. The EUV radiation field is modeled including contributions from discrete stellar sources and from a thermal bremsstrahlung-radiative recombination spectrum emitted from the surrounding 10(exp 6) K coronal substrate. Lower limits to the fractional ionization of hydrogen and helium of 0.17 and 0.30 respectively are established. The derived limits have important implications for the interpretation of the H I andmore » He I backscattering results. The high He ionization fraction results primarily from very strong line emission below 500 A originating in the surrounding coronal substrate while the H ionization is dominated by the EUV radiation from the discrete stellar sources. The dual effects of thermal conduction and the EUV spectrum of the 10(exp 6) K plasma on ionization in the cloud skin are explored. The EUV radiation field and Auger ionization have insignificant effects on the resulting ionic column densities of Si IV, C IV, N V and O VI through the cloud skin. Calculations show that the abundances of these species are dominated by collisional ionization in the thermal conduction front. Because of a low charge exchange rate with hydrogen, the ionic column density ratios of N(C III)/N(C II) and N(N II)/N(N I) are dominated by the EUV radiation field in the local interstellar medium. These ratios should be important diagnostics for the EUV radiation field and serve as surrogate indicators of the interstellar He and H ionization fraction respectively. The same photoionization model is applied to the intergalactic medium.« less

Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography

NASA Astrophysics Data System (ADS)

Madey, Theodore E.; Faradzhev, Nadir S.; Yakshinskiy, Boris V.; Edwards, N. V.

2006-12-01

One of the most promising methods for next generation device manufacturing is extreme ultraviolet (EUV) lithography, which uses 13.5 nm wavelength radiation generated from freestanding plasma-based sources. The short wavelength of the incident illumination allows for a considerable decrease in printed feature size, but also creates a range of technological challenges not present for traditional optical lithography. Contamination and oxidation form on multilayer reflecting optics surfaces that not only reduce system throughput because of the associated reduction in EUV reflectivity, but also introduce wavefront aberrations that compromise the ability to print uniform features. Capping layers of ruthenium, films ∼2 nm thick, are found to extend the lifetime of Mo/Si multilayer mirrors used in EUV lithography applications. However, reflectivities of even the Ru-coated mirrors degrade in time during exposure to EUV radiation. Ruthenium surfaces are chemically reactive and are very effective as heterogeneous catalysts. In the present paper we summarize the thermal and radiation-induced surface chemistry of bare Ru exposed to gases; the emphasis is on H2O vapor, a dominant background gas in vacuum processing chambers. Our goal is to provide insights into the fundamental physical processes that affect the reflectivity of Ru-coated Mo/Si multilayer mirrors exposed to EUV radiation. Our ultimate goal is to identify and recommend practices or antidotes that may extend mirror lifetimes.

High-harmonic generation by field enhanced femtosecond pulses in metal-sapphire nanostructure

PubMed Central

Han, Seunghwoi; Kim, Hyunwoong; Kim, Yong Woo; Kim, Young-Jin; Kim, Seungchul; Park, In-Yong; Kim, Seung-Woo

2016-01-01

Plasmonic high-harmonic generation (HHG) drew attention as a means of producing coherent extreme ultraviolet (EUV) radiation by taking advantage of field enhancement occurring in metallic nanostructures. Here a metal-sapphire nanostructure is devised to provide a solid tip as the HHG emitter, replacing commonly used gaseous atoms. The fabricated solid tip is made of monocrystalline sapphire surrounded by a gold thin-film layer, and intended to produce EUV harmonics by the inter- and intra-band oscillations of electrons driven by the incident laser. The metal-sapphire nanostructure enhances the incident laser field by means of surface plasmon polaritons, triggering HHG directly from moderate femtosecond pulses of ∼0.1 TW cm−2 intensities. The measured EUV spectra exhibit odd-order harmonics up to ∼60 nm wavelengths without the plasma atomic lines typically seen when using gaseous atoms as the HHG emitter. This experimental outcome confirms that the plasmonic HHG approach is a promising way to realize coherent EUV sources for nano-scale near-field applications in spectroscopy, microscopy, lithography and atto-second physics. PMID:27721374

Extreme Ultraviolet Explorer Bright Source List

NASA Technical Reports Server (NTRS)

Malina, Roger F.; Marshall, Herman L.; Antia, Behram; Christian, Carol A.; Dobson, Carl A.; Finley, David S.; Fruscione, Antonella; Girouard, Forrest R.; Hawkins, Isabel; Jelinsky, Patrick

1994-01-01

Initial results from the analysis of the Extreme Ultraviolet Explorer (EUVE) all-sky survey (58-740 A) and deep survey (67-364 A) are presented through the EUVE Bright Source List (BSL). The BSL contains 356 confirmed extreme ultraviolet (EUV) point sources with supporting information, including positions, observed EUV count rates, and the identification of possible optical counterparts. One-hundred twenty-six sources have been detected longward of 200 A.

High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas

NASA Astrophysics Data System (ADS)

Musgrave, Christopher S. A.; Murakami, Takehiro; Ugomori, Teruyuki; Yoshida, Kensuke; Fujioka, Shinsuke; Nishimura, Hiroaki; Atarashi, Hironori; Iyoda, Tomokazu; Nagai, Keiji

2017-03-01

With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography, constant improvements in light source design and cost-efficiency are required. Currently, light intensity and conversion efficiency (CE) measurments are obtained by charged couple devices, faraday cups etc, but also phoshpor imaging plates (IPs) (BaFBr:Eu). IPs are sensitive to light and high-energy species, which is ideal for studying extreme ultraviolet (EUV) light from laser produced plasmas (LPPs). In this work, we used IPs to observe a large angular distribution (10°-90°). We ablated a tin target by high-energy lasers (1064 nm Nd:YAG, 1010 and 1011 W/cm2) to generate the EUV light. The europium ions in the IP were trapped in a higher energy state from exposure to EUV light and high-energy species. The light intensity was angular dependent; therefore excitation of the IP depends on the angle, and so highly informative about the LPP. We obtained high-space resolution (345 μm, 0.2°) angular distribution and grazing spectrometer (5-20 nm grate) data simultaneously at different target to IP distances (103 mm and 200 mm). Two laser systems and IP types (BAS-TR and BAS-SR) were also compared. The cosine fitting values from the IP data were used to calculate the CE to be 1.6% (SD ± 0.2) at 13.5 nm 2% bandwidth. Finally, a practical assessment of IPs and a damage issue are disclosed.

Measuring Solar Doppler Velocities in the He II 30.38 nm Emission Using the EUV Variability Experiment (EVE)

NASA Technical Reports Server (NTRS)

Chamberlin, Phillip Clyde

2016-01-01

The EUV Variability Experiment (EVE) onboard the Solar Dynamics Observatory has provided unprecedented measurements of the solar EUV irradiance at high temporal cadence with good spectral resolution and range since May 2010. The main purpose of EVE was to connect the Sun to the Earth by providing measurements of the EUV irradianceas a driver for space weather and Living With a Star studies, but after launch the instrument has demonstrated the significance of its measurements in contributing to studies looking at the sources of solar variability for pure solar physics purposes. This paper expands upon previous findings that EVE can in fact measure wavelength shifts during solar eruptive events and therefore provide Doppler velocities for plasma at all temperatures throughout the solar atmosphere from the chromosphere to hot flaring temperatures. This process is not straightforward as EVE was not designed or optimized for these types of measurements. In this paper we describe the many detailed instrumental characterizations needed to eliminate the optical effects in order to provide an absolute baseline for the Doppler shift studies. An example is given of a solar eruption on 7 September 2011 (SOL2011-09-07), associated with an X1.2 flare, where EVE Doppler analysis shows plasma ejected from the Sun in the He II 30.38 nm emission at a velocity of almost 120 km s(exp -1) along the line-of-sight.

GLOBAL ENERGETICS OF SOLAR FLARES. IV. CORONAL MASS EJECTION ENERGETICS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Aschwanden, Markus J., E-mail: aschwanden@lmsal.com

2016-11-01

This study entails the fourth part of a global flare energetics project, in which the mass m {sub cme}, kinetic energy E {sub kin}, and the gravitational potential energy E {sub grav} of coronal mass ejections (CMEs) is measured in 399 M and X-class flare events observed during the first 3.5 years of the Solar Dynamics Observatory (SDO) mission, using a new method based on the EUV dimming effect. EUV dimming is modeled in terms of a radial adiabatic expansion process, which is fitted to the observed evolution of the total emission measure of the CME source region. The modelmore » derives the evolution of the mean electron density, the emission measure, the bulk plasma expansion velocity, the mass, and the energy in the CME source region. The EUV dimming method is truly complementary to the Thomson scattering method in white light, which probes the CME evolution in the heliosphere at r ≳ 2 R {sub ⊙}, while the EUV dimming method tracks the CME launch in the corona. We compare the CME parameters obtained in white light with the LASCO/C2 coronagraph with those obtained from EUV dimming with the Atmospheric Imaging Assembly onboard the SDO for all identical events in both data sets. We investigate correlations between CME parameters, the relative timing with flare parameters, frequency occurrence distributions, and the energy partition between magnetic, thermal, nonthermal, and CME energies. CME energies are found to be systematically lower than the dissipated magnetic energies, which is consistent with a magnetic origin of CMEs.« less

Inner Magnetospheric Electric Fields Derived from IMAGE EUV

NASA Technical Reports Server (NTRS)

Gallagher, D. L.; Adrian, M. L.

2007-01-01

The local and global patterns of plasmaspheric plasma transport reflect the influence of electric fields imposed by all sources in the inner magnetosphere. Image sequences of thermal plasma G:istribution obtained from the IMAGE Mission Extreme Ultraviolet Imager can be used to derive plasma motions and, using a magnetic field model, the corresponding electric fields. These motions and fields directly reflect the dynamic coupling of injected plasmasheet plasma and the ionosphere, in addition to solar wind and atmospheric drivers. What is being learned about the morphology of inner magnetospheric electric fields during storm and quite conditions from this new empirical tool will be presented and discussed.

QCL seeded, ns-pulse, multi-line, CO2 laser oscillator for laser-produced-plasma extreme-UV source

NASA Astrophysics Data System (ADS)

Nowak, Krzysztof Michał; Suganuma, Takashi; Kurosawa, Yoshiaki; Ohta, Takeshi; Kawasuji, Yasufumi; Nakarai, Hiroaki; Saitou, Takashi; Fujimoto, Junichi; Mizoguchi, Hakaru; Sumitani, Akira; Endo, Akira

2017-01-01

Successful merger of state-of-the-art, semiconductor quantum-cascade lasers (QCL), with the mature CO2 laser technology, resulted in a delivery of highly-desired qualities of CO2 laser output that were not available previously without much effort. These qualities, such as multi-line operation, excellent spectro-temporal stability and pulse waveform control, became available from a single device of moderate complexity. This paper describes the operation principle and the unique properties of the solid{state seeded CO2 laser, invented for an application in laser-produced-plasma (LPP), extreme-UV (EUV) light source.

The Solar Flux Dependence of Ionospheric 150 km Radar Echoes and Implications

NASA Astrophysics Data System (ADS)

Patra, A. K.; Pavan Chaitanya, P.; St.-Maurice, J.-P.; Otsuka, Y.; Yokoyama, T.; Yamamoto, M.

2017-11-01

Radar echoes from the daytime equatorial ionospheric F1 region, popularly known as "150 km echoes," have challenged ionospheric plasma physicists for several decades. Recent theoretical simulations showed that enhanced photoelectron fluxes can amplify the amplitude of plasma waves, generating spectra similar to those of the radar echoes, implying that larger solar fluxes should produce more frequent and stronger 150 km echoes. Inspired by this proposal, we studied the occurrence and intensity dependence of the echoes on the EUV flux observed by SOHO over several years. The occurrence and intensity of the echoes were found to have an inverse relationship with this EUV flux measurement. The multiyear trend is independent of the variability often observed over successive days with nearly identical EUV fluxes. These results imply that the relationship between the echoes and EUV flux is more complex. We propose that gravity waves modulate the amplitude of 150 km echoes through changes in the variations in plasma density and photoelectron fluxes associated with the gravity wave-induced neutral density modulations.

Spectroscopy of Highly Charged Tin Ions for AN Extreme Ultraviolet Light Source for Lithography

NASA Astrophysics Data System (ADS)

Torretti, Francesco; Windberger, Alexander; Ubachs, Wim; Hoekstra, Ronnie; Versolato, Oscar; Ryabtsev, Alexander; Borschevsky, Anastasia; Berengut, Julian; Crespo Lopez-Urrutia, Jose

2017-06-01

Laser-produced tin plasmas are the prime candidates for the generation of extreme ultraviolet (EUV) light around 13.5 nm in nanolithographic applications. This light is generated primarily by atomic transitions in highly charged tin ions: Sn^{8+}-Sn^{14+}. Due to the electronic configurations of these charge states, thousands of atomic lines emit around 13.5 nm, clustered in a so-called unresolved transition array. As a result, accurate line identification becomes difficult in this regime. Nevertheless, this issue can be circumvented if one turns to the optical: with far fewer atomic states, only tens of transitions take place and the spectra can be resolved with far more ease. We have investigated optical emission lines in an electron-beam-ion-trap (EBIT), where we managed to charge-state resolve the spectra. Based on this technique and on a number of different ab initio techniques for calculating the level structure, the optical spectra could be assigned [1,2]. As a conclusion the assignments of EUV transitions in the literature require corrections. The EUV and optical spectra are measured simultaneously in the controlled conditions of the EBIT as well as in a droplet-based laser-produced plasma source providing information on the contribution of Sn^{q+} charge states to the EUV emission. [1] A. Windberger, F. Torretti, A. Borschevsky, A. Ryabtsev, S. Dobrodey, H. Bekker, E. Eliav, U. Kaldor, W. Ubachs, R. Hoekstra, J.R. Crespo Lopez-Urrutia, O.O. Versolato, Analysis of the fine structure of Sn^{11+} - Sn^{14+} ions by optical spectroscopy in an electron beam ion trap, Phys. Rev. A 94, 012506 (2016). [2] F. Torretti, A. Windberger, A. Ryabtsev, S. Dobrodey, H. Bekker, W. Ubachs, R. Hoekstra, E.V. Kahl, J.C. Berengut, J.R. Crespo Lopez-Urrutia, O.O. Versolato, Optical spectroscopy of complex open 4d-shell ions Sn^{7+} - Sn^{10+}, arXiv:1612.00747

Generation of warm dense matter using an argon based capillary discharge laser

NASA Astrophysics Data System (ADS)

Rossall, A. K.; Tallents, G. J.

2015-06-01

Argon based capillary discharge lasers operating in the extreme ultra violet (EUV) at 46.9 nm with output up to 0.5 mJ energy per pulse and repetition rates up to 10 Hz are capable of focused irradiances of 109-1012 W cm-2 and can be used to generate plasma in the warm dense matter regime by irradiating solid material. To model the interaction between such an EUV laser and solid material, the 2D radiative-hydrodynamic code POLLUX has been modified to include absorption via direct photo-ionisation, a super-configuration model to describe the ionization-dependent electronic configurations and a calculation of plasma refractive indices for ray tracing of the incident EUV laser radiation. A simulation study is presented, demonstrating how capillary discharge lasers of 1200 ps pulse duration can be used to generate warm dense matter at close to solid densities with temperatures of a few eV and energy densities up to 1 × 105 J cm-3. Plasmas produced by EUV laser irradiation are shown to be useful for examining the properties of warm dense matter as, for example, plasma emission is not masked by hotter, less dense plasma emission that occurs with visible/infra-red laser target irradiation.

Extreme Ultraviolet Explorer. Long look at the next window

NASA Technical Reports Server (NTRS)

Maran, Stephen P.

1991-01-01

The Extreme Ultraviolet Explorer (EUVE) will map the entire sky to determine the existence, direction, brightness, and temperature of thousands of objects that are sources of so-called extreme ultraviolet (EUV) radiation. The EUV spectral region is located between the x-ray and ultraviolet regions of the electromagnetic spectrum. From the sky survey by EUVE, astronomers will determine the nature of sources of EUV light in our galaxy, and infer the distribution of interstellar gas for hundreds of light years around the solar system. It is from this gas and the accompanying dust in space that new stars and solar systems are born and to which evolving and dying stars return much of their material in an endless cosmic cycle of birth, death, and rebirth. Besides surveying the sky, astronomers will make detailed studies of selected objects with EUVE to determine their physical properties and chemical compositions. Also, they will learn about the conditions that prevail and the processes at work in stars, planets, and other sources of EUV radiation, maybe even quasars. The EUVE mission and instruments are described. The objects that EUVE will likely find are described.

Plasmaspheric Erosion via Plasmasphere Coupling to Ring Current Plasmas: EUV Observations and Modeling

NASA Technical Reports Server (NTRS)

Adrian, M. L.; Gallagher, D. L.; Khazanov, G. V.; Chsang, S. W.; Liemohn, M. W.; Perez, J. D.; Green, J. L.; Sandel, B. R.; Mitchell, D. G.; Mende, S. B.;

Selected highlights from the Extreme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Bowyer, S.; Malina, R. F.

1995-01-01

We present a few scientific highlights from the Extreme Ultraviolet Explorer (EUVE) all-sky and deep surveys, from the EUVE Righ Angle Program, and from the EUVE Guest Observer Program. The First EUVE Source Catalog includes 410 extreme ultraviolet (EUV) sources detected in the initial processing of the EUVE all-sky data. A program of optical identification indicates that counterparts include cool star coronae, flare stars, hot white dwarfs, central stars of planetary nebulae, B star photospheres and winds, an X-ray binary, extragalactic objects (active galactic nuclei, BL Lacertae), solar system objects (Moon, Mars, Io,), supernova remnants, and two novae.

Extreme ultraviolet interferometry of warm dense matter in laser plasmas.

PubMed

Gartside, L M R; Tallents, G J; Rossall, A K; Wagenaars, E; Whittaker, D S; Kozlová, M; Nejdl, J; Sawicka, M; Polan, J; Kalal, M; Rus, B

2010-11-15

We demonstrate that interferometric probing with extreme ultraviolet (EUV) laser light enables determination of the degree of ionization of the "warm dense matter" produced between the critical and ablation surfaces of laser plasmas. Interferometry has been utilized to measure both transmission and phase information for an EUV laser beam at the photon energy of 58.5 eV, probing longitudinally through laser-irradiated plastic (parylene-N) targets (thickness 350 nm) irradiated by a 300 ps duration pulse of wavelength 438 nm and peak irradiance 10(12) W cm(-2). The transmission of the EUV probe beam provides a measure of the rate of target ablation, as ablated plasma becomes close to transparent when the photon energy is less than the ionization energy of the predominant ion species. We show that refractive indices η below the solid parylene N (η(solid) = 0.946) and expected plasma values are produced in the warm dense plasma created by laser irradiation due to bound-free absorption in C(+).

Design requirements for a stand alone EUV interferometer

NASA Astrophysics Data System (ADS)

Michallon, Ph.; Constancias, C.; Lagrange, A.; Dalzotto, B.

2008-03-01

EUV lithography is expected to be inserted for the 32/22 nm nodes with possible extension below. EUV resist availability remains one of the main issues to be resolved. There is an urgent need to provide suitable tools to accelerate resist development and to achieve resolution, LER and sensitivity specifications simultaneously. An interferometer lithography tool offers advantages regarding conventional EUV exposure tool. It allows the evaluation of resists, free from the deficiencies of optics and mask which are limiting the achieved resolution. Traditionally, a dedicated beam line from a synchrotron, with limited access, is used as a light source in EUV interference lithography. This paper identifies the technology locks to develop a stand alone EUV interferometer using a compact EUV source. It will describe the theoretical solutions adopted and especially look at the feasibility according to available technologies. EUV sources available on the market have been evaluated in terms of power level, source size, spatial coherency, dose uniformity, accuracy, stability and reproducibility. According to the EUV source characteristics, several optic designs were studied (simple or double gratings). For each of these solutions, the source and collimation optic specifications have been determined. To reduce the exposure time, a new grating technology will also be presented allowing to significantly increasing the transmission system efficiency. The optical grating designs were studied to allow multi-pitch resolution print on the same exposure without any focus adjustment. Finally micro mechanical system supporting the gratings was studied integrating the issues due to vacuum environment, alignment capability, motion precision, automation and metrology to ensure the needed placement control between gratings and wafer. A similar study was carried out for the collimation-optics mechanical support which depends on the source characteristics.

Galileo Ultraviolet Spectrometer experiment

NASA Technical Reports Server (NTRS)

Hord, C. W.; Mcclintock, W. E.; Stewart, A. I. F.; Barth, C. A.; Esposito, L. W.; Thomas, G. E.; Sandel, B. R.; Hunten, D. M.; Broadfoot, A. L.; Shemansky, D. E.

1992-01-01

The Galileo ultraviolet spectrometer experiment uses data obtained by the Ultraviolet Spectrometer (UVS) mounted on the pointed orbiter scan platform and from the Extreme Ultraviolet Spectrometer (EUVS) mounted on the spinning part of the orbiter with the field of view perpendicular to the spin axis. The UVS is a Ebert-Fastie design that covers the range 113-432 nm with a wavelength resolution of 0.7 nm below 190 and 1.3 nm at longer wavelengths. The UVS spatial resolution is 0.4 deg x 0.1 deg for illuminated disk observations and 1 deg x 0.1 deg for limb geometries. The EUVS is a Voyager design objective grating spectrometer, modified to cover the wavelength range from 54 to 128 nm with wavelength resolution 3.5 nm for extended sources and 1.5 nm for point sources and spatial resolution of 0.87 deg x 0.17 deg. The EUVS instrument will follow up on the many Voyager UVS discoveries, particularly the sulfur and oxygen ion emissions in the Io torus and molecular and atomic hydrogen auroral and airglow emissions from Jupiter. The UVS will obtain spectra of emission, absorption, and scattering features in the unexplored, by spacecraft, 170-432 nm wavelength region. The UVS and EUVS instruments will provide a powerful instrument complement to investigate volatile escape and surface composition of the Galilean satellites, the Io plasma torus, micro- and macro-properties of the Jupiter clouds, and the composition structure and evolution of the Jupiter upper atmosphere.

Characterization and control of EUV scanner dose uniformity and stability

NASA Astrophysics Data System (ADS)

Robinson, Chris; Corliss, Dan; Meli, Luciana; Johnson, Rick

2018-03-01

The EUV source is an impressive feat of engineering that provides 13.5 nm radiation by vaporizing tin droplets with a high power CO2 laser and focusing the photons produced in the resultant plasma into the scanner illumination system. Great strides have been made in addressing the many potential stability challenges, but there are still residual spatial and temporal dose non-uniformity signatures. Since even small dose errors can impact the yieldable process window for the advanced lithography products that are exposed on EUV scanners it is crucial to monitor and control the dose variability. Using on-board metrology, the EUV scanner outputs valuable metrics that provide real time insight into the dose performance. We have supplemented scanner data collection with a wafer based methodology that provides high throughput, high sensitivity, quantitative characterization of the EUV scanner dose delivery. The technique uses open frame EUV exposures, so it is exclusive of lithographic pattern imaging, exclusive of lithographic mask pattern and not limited by placement of metrology features. Processed wafers are inspected rapidly, providing 20,000 pixels of detail per exposure field in approximately one minute. Exposing the wafer on the scanner with a bit less than the resist E0 (open frame clearing dose) results in good sensitivity to small variations in the EUV dose delivered. The nominal exposure dose can be modulated by field to calibrate the inspection results and provide quantitative assessment of variations with < 1% sensitivity. This technique has been used for dose uniformity assessments. It is also being used for long term dose stability monitoring and has proven valuable for short term dose stability follow up investigations.

Study of extreme-ultraviolet emission and properties of a coronal streamer from PROBA2/SWAP, HINODE/EIS and Mauna Loa Mk4 observations

DOE Office of Scientific and Technical Information (OSTI.GOV)

Goryaev, F.; Slemzin, V.; Vainshtein, L.

2014-02-01

Wide-field extreme-ultraviolet (EUV) telescopes imaging in spectral bands sensitive to 1 MK plasma on the Sun often observe extended, ray-like coronal structures stretching radially from active regions to distances of 1.5-2 R {sub ☉}, which represent the EUV counterparts of white-light streamers. To explain this phenomenon, we investigated the properties of a streamer observed on 2010 October 20 and 21, by the PROBA2/SWAP EUV telescope together with the Hinode/EIS (HOP 165) and the Mauna Loa Mk4 white-light coronagraph. In the SWAP 174 Å band comprising the Fe IX-Fe XI lines, the streamer was detected to a distance of 2 Rmore » {sub ☉}. We assume that the EUV emission is dominated by collisional excitation and resonant scattering of monochromatic radiation coming from the underlying corona. Below 1.2 R {sub ☉}, the plasma density and temperature were derived from the Hinode/EIS data by a line-ratio method. Plasma conditions in the streamer and in the background corona above 1.2 R {sub ☉} from the disk center were determined by forward-modeling the emission that best fit the observational data in both EUV and white light. It was found that the plasma in the streamer above 1.2 R {sub ☉} is nearly isothermal, with a temperature of T = 1.43 ± 0.08 MK. The hydrostatic scale-height temperature determined from the evaluated density distribution was significantly higher (1.72 ± 0.08 MK), which suggests the existence of outward plasma flow along the streamer. We conclude that, inside the streamer, collisional excitation provided more than 90% of the observed EUV emission, whereas, in the background corona, the contribution of resonance scattering became comparable with that of collisions at R ≳ 2 R {sub ☉}.« less

Plasma expansion dynamics physics: An understanding on ion energy reduction process

NASA Astrophysics Data System (ADS)

Ruzic, David; Srivastava, Shailendra; Thompson, Keith; Spencer, Joshua; Sporre, John

2007-11-01

This paper studies the expanding plasma dynamics of ions produced from a 5J Z-pinch xenon light source used for EUV lithography. Ion energy reduction is essential for the successful implementation of this technology. To aid this investigation, ion energy from a z-pinch DPP plasma source is measured using an ion energy analyzer and effect of introducing a small percentage of low Z material on the ion energy and flux is investigated. Presence of low mass such as H2 or N2, shows a considerable reduction in total flux and in average energy. For example, Xe^+ ion flux at 5 keV are recorded as 425 ± 42 ions/cm^2.eV.pulse at 157 cm and reduced to 125 ± 12 ions/cm^2.eV.pulse when using the low mass into the system at same energy. It is also noticed that such a combination leads to decrease in sputtering without changing the EUV output. Study of the possible mechanism supporting the experimental results is numerically calculated. This computational work indicates that the observed high energies of ions are probably resulting from coulomb explosion initiated by pinch instability. It is postulated that the electrons leave first setting up an electrostatic potential which accelerates the ions. The addition of small mass actually screens the potential and decorates the ions.

A New Relationship Between Soft X-Rays and EUV Flare Light Curves

NASA Astrophysics Data System (ADS)

Thiemann, Edward

2016-05-01

Solar flares are the result of magnetic reconnection in the solar corona which converts magnetic energy into kinetic energy resulting in the rapid heating of solar plasma. As this plasma cools, it emits radiation at different EUV wavelengths when the dropping temperature passes a line’s temperature of formation. This results in a delay in the emissions from cooler EUV lines relative to hotter EUV lines. Therefore, characterizing how this hot plasma cools is important for understanding how the corresponding geo-effective extreme ultraviolet (EUV) irradiance evolves in time. I present a simple new framework in which to study flare cooling by using a Lumped Element Thermal Model (LETM). LETM is frequently used in science and engineering to simplify a complex multi-dimensional thermal system by reducing it to a 0-D thermal circuit. For example, a structure that conducts heat out of a system is simplified with a resistive element and a structure that allows a system to store heat is simplified with a capacitive element. A major advantage of LETM is that the specific geometry of a system can be ignored, allowing for an intuitive analysis of the major thermal processes. I show that LETM is able to accurately reproduce the temporal evolution of cooler flare emission lines based on hotter emission line evolution. In particular, it can be used to predict the evolution of EUV flare light curves using the NOAA X-Ray Sensor (XRS).

Integrated approach to improving local CD uniformity in EUV patterning

NASA Astrophysics Data System (ADS)

Liang, Andrew; Hermans, Jan; Tran, Timothy; Viatkina, Katja; Liang, Chen-Wei; Ward, Brandon; Chuang, Steven; Yu, Jengyi; Harm, Greg; Vandereyken, Jelle; Rio, David; Kubis, Michael; Tan, Samantha; Dusa, Mircea; Singhal, Akhil; van Schravendijk, Bart; Dixit, Girish; Shamma, Nader

2017-03-01

Extreme ultraviolet (EUV) lithography is crucial to enabling technology scaling in pitch and critical dimension (CD). Currently, one of the key challenges of introducing EUV lithography to high volume manufacturing (HVM) is throughput, which requires high source power and high sensitivity chemically amplified photoresists. Important limiters of high sensitivity chemically amplified resists (CAR) are the effects of photon shot noise and resist blur on the number of photons received and of photoacids generated per feature, especially at the pitches required for 7 nm and 5 nm advanced technology nodes. These stochastic effects are reflected in via structures as hole-to-hole CD variation or local CD uniformity (LCDU). Here, we demonstrate a synergy of film stack deposition, EUV lithography, and plasma etch techniques to improve LCDU, which allows the use of high sensitivity resists required for the introduction of EUV HVM. Thus, to improve LCDU to a level required by 5 nm node and beyond, film stack deposition, EUV lithography, and plasma etch processes were combined and co-optimized to enhance LCDU reduction from synergies. Test wafers were created by depositing a pattern transfer stack on a substrate representative of a 5 nm node target layer. The pattern transfer stack consisted of an atomically smooth adhesion layer and two hardmasks and was deposited using the Lam VECTOR PECVD product family. These layers were designed to mitigate hole roughness, absorb out-of-band radiation, and provide additional outlets for etch to improve LCDU and control hole CD. These wafers were then exposed through an ASML NXE3350B EUV scanner using a variety of advanced positive tone EUV CAR. They were finally etched to the target substrate using Lam Flex dielectric etch and Kiyo conductor etch systems. Metrology methodologies to assess dimensional metrics as well as chip performance and defectivity were investigated to enable repeatable patterning process development. Illumination conditions in EUV lithography were optimized to improve normalized image log slope (NILS), which is expected to reduce shot noise related effects. It can be seen that the EUV imaging contrast improvement can further reduce post-develop LCDU from 4.1 nm to 3.9 nm and from 2.8 nm to 2.6 nm. In parallel, etch processes were developed to further reduce LCDU, to control CD, and to transfer these improvements into the final target substrate. We also demonstrate that increasing post-develop CD through dose adjustment can enhance the LCDU reduction from etch. Similar trends were also observed in different pitches down to 40 nm. The solutions demonstrated here are critical to the introduction of EUV lithography in high volume manufacturing. It can be seen that through a synergistic deposition, lithography, and etch optimization, LCDU at a 40 nm pitch can be improved to 1.6 nm (3-sigma) in a target oxide layer and to 1.4 nm (3-sigma) at the photoresist layer.

The effect of viewing angle on the spectral behavior of a Gd plasma source near 6.7 nm

DOE Office of Scientific and Technical Information (OSTI.GOV)

O'Gorman, Colm; Li Bowen; Cummins, Thomas

2012-04-02

We have demonstrated the effect of viewing angle on the extreme ultraviolet (EUV) emission spectra of gadolinium (Gd) near 6.7 nm. The spectra are shown to have a strong dependence on viewing angle when produced with a laser pulse duration of 10 ns, which may be attributed to absorption by low ion stages of Gd and an angular variation in the ion distribution. Absorption effects are less pronounced at a 150-ps pulse duration due to reduced opacity resulting from plasma expansion. Thus for evaluating source intensity, it is necessary to allow for variation with both viewing angle and target orientation.

Test of an argon cusp plasma for tin LPP power scaling

NASA Astrophysics Data System (ADS)

McGeoch, Malcolm W.

2015-03-01

Scaling the power of the tin droplet laser-produced-plasma (LPP) extreme ultraviolet (EUV) source to 500W has eluded the industry after a decade of effort. In 2014 we proposed [2] a solution: placing the laser-plasma interaction region within an argon plasma in a magnetic cusp. This would serve to ionize tin atoms and guide them to a large area annular beam dump. We have since demonstrated the feasibility of this approach. We present first results from a full-scale test plasma at power levels relevant to the generation of at least 200W, showing both that the argon cusp plasma is very stable, and that its geometrical properties are ideal for the transport of exhaust power and tin to the beam dump.

Evidence for a New Class of Extreme Ultraviolet Sources

NASA Technical Reports Server (NTRS)

Maoz, Dan; Ofek, Eran O.; Shemi, Amotz

1997-01-01

Most of the sources detected in the extreme ultraviolet (EUV; 100-600 A) by the ROSAT/WFC and EUVE all-sky surveys have been identified with active late-type stars and hot white dwarfs that are near enough to the Earth to escape absorption by interstellar gas. However, about 15 per cent of EUV sources are as yet unidentified with any optical counterparts. We examine whether the unidentified EUV sources may consist of the same population of late-type stars and white dwarfs. We present B and R photometry of stars in the fields of seven of the unidentified EUV sources. We detect in the optical the entire main-sequence and white dwarf population out to the greatest distances where they could still avoid absorption. We use color-magnitude diagrams to demonstrate that, in most of the fields, none of the observed stars has the colours and magnitudes of late-type dwarfs at distances less than 100 pc. Similarly, none of the observed stars is a white dwarf within 500 pc that is hot enough to be a EUV emitter. The unidentified EUV sources we study are not detected in X-rays, while cataclysmic variables, X-ray binaries, and active galactic nuclei generally are. We conclude that some of the EUV sources may be a new class of nearby objects, which are either very faint at optical bands or which mimic the colours and magnitudes of distant late-type stars or cool white dwarfs. One candidate for optically faint objects is isolated old neutron stars, slowly accreting interstellar matter. Such neutron stars are expected to be abundant in the Galaxy, and have not been unambiguously detected.

Prospective EUV observations of hot DA white dwarfs with the EUV Explorer

NASA Technical Reports Server (NTRS)

Finley, David S.; Malina, Roger F.; Bowyer, Stuart

1987-01-01

The Extreme Ultraviolet Explorer (EUVE) will perform a high sensitivity EUV all-sky survey. A major category of sources which will be detected with the EUVE instruments consists of hot white dwarfs. Detailed preliminary studies of synthetic EUV observations of white dwarfs have been carried out using the predicted EUVE instrumental response functions. Using available information regarding space densities of white dwarfs and the distribution of neutral hydrogen in the interstellar medium, the numbers of DA white dwarfs which will be detectable in the different EUV bandpasses have been estimated.

Microwave ion source

DOEpatents

Leung, Ka-Ngo; Reijonen, Jani; Thomae, Rainer W.

2005-07-26

A compact microwave ion source has a permanent magnet dipole field, a microwave launcher, and an extractor parallel to the source axis. The dipole field is in the form of a ring. The microwaves are launched from the middle of the dipole ring using a coaxial waveguide. Electrons are heated using ECR in the magnetic field. The ions are extracted from the side of the source from the middle of the dipole perpendicular to the source axis. The plasma density can be increased by boosting the microwave ion source by the addition of an RF antenna. Higher charge states can be achieved by increasing the microwave frequency. A xenon source with a magnetic pinch can be used to produce intense EUV radiation.

Observation of EUVL mask using coherent EUV scatterometry microscope with high-harmonic-generation EUV source

NASA Astrophysics Data System (ADS)

Mamezaki, Daiki; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo

2017-07-01

In extreme ultraviolet (EUV) lithography, development of review tools for EUV mask pattern and phase defect at working wavelength of 13.5 nm is required. The EUV mask is composed of an absorber pattern (50 - 70 nm thick) and Mo/Si multilayer (280 nm thick) on a glass substrate. This mask pattern seems three-dimensional (3D) structure. This 3D structure would modulate EUV reflection phase, which would cause focus and pattern shifts. Thus, EUV phase imaging is important to evaluate this phase modulation. We have developed coherent EUV scatterometry microscope (CSM), which is a simple microscope without objective optics. EUV phase and intensity image are reconstructed with diffraction images by ptychography with coherent EUV illumination. The high-harmonic-generation (HHG) EUV source was employed for standalone CSM system. In this study, we updated HHG system of pump-laser reduction and gas-pressure control. Two types of EUV mask absorber patterns were observed. An 88-nm lines-and-spaces and a cross-line patterns were clearly reconstructed by ptychography. In addition, a natural defect with 2-μm diameter on the cross-line was well reconstructed. This demonstrated the high capability of the standalone CSM, which system will be used in the factories, such as mask shops and semiconductor fabrication plants.

Dynamics of the spatial electron density distribution of EUV-induced plasmas

NASA Astrophysics Data System (ADS)

van der Horst, R. M.; Beckers, J.; Osorio, E. A.; Banine, V. Y.

2015-11-01

We studied the temporal evolution of the electron density distribution in a low pressure pulsed plasma induced by high energy extreme ultraviolet (EUV) photons using microwave cavity resonance spectroscopy (MCRS). In principle, MCRS only provides space averaged information about the electron density. However, we demonstrate here the possibility to obtain spatial information by combining multiple resonant modes. It is shown that EUV-induced plasmas, albeit being a rather exotic plasma, can be explained by known plasma physical laws and processes. Two stages of plasma behaviour are observed: first the electron density distribution contracts, after which it expands. It is shown that the contraction is due to cooling of the electrons. The moment when the density distribution starts to expand is related to the inertia of the ions. After tens of microseconds, the electrons reached the wall of the cavity. The speed of this expansion is dependent on the gas pressure and can be divided into two regimes. It is shown that the acoustic dominated regime the expansion speed is independent of the gas pressure and that in the diffusion dominated regime the expansion depends reciprocal on the gas pressure.

Million Degree Plasmas in Extreme Ultraviolet (EUV) Astrophysics. White Paper in Response to Astro2010 Science Call

DTIC Science & Technology

2010-01-01

photometry , timing measurements of suitable cadence, and advanced theory are the keys to understanding the physics of million degree plasmas in...Disentangling these components requires time - and phase- resolved spectroscopic observations of a sample that spans a range of mass accretion rates...many narrow lines, or a continuum with strong, broad absorption features. Key Objective: Obtaining time - and phase- resolved high-resolution EUV

Collisional excitation and radiative properties of N II - The strong intercombination (1D - 3P0) transition at 748 A

NASA Technical Reports Server (NTRS)

Tripp, T. M.; Shemansky, D. E.; James, G. K.; Ajello, J. M.

1991-01-01

Laboratory measurements of EUV emission from electron-excited N2 have been obtained at medium resolution, providing N II EUV emission cross section measurements and allowing the confirmation of recent calculations by Fawcett (1987) indicating the presence of a strong intercombination line in N II at 748.37 A. The most recently available data are used to predict the basic collisional and radiative properties of N II, the plasma diagnostic properties are briefly explored, and radiative cooling coefficients are given. Some basic properties of electron-excited N II and N2 are examined in the EUV in order to diagnose emission spectra of the earth and Titan. The N II emissions in the earth dayglow, particularly at 916 A, are much brighter than current estimates of source rates. The N II 1085 A line in the dayglow contains a significant component from dissociative photoionization excitation. The N II 1085 A, 916 A, and 670 A lines in the Titan dayglow spectrum appear to be compatible with direct electron excitation of N2.

EUV Cross-Calibration Strategies for the GOES-R SUVI

NASA Astrophysics Data System (ADS)

Darnel, Jonathan; Seaton, Daniel

2016-10-01

The challenges of maintaining calibration for solar EUV instrumentation is well-known. The lack of standard calibration sources and the fact that most solar EUV telescopes are incapable of utilizing bright astronomical EUV sources for calibration make knowledge of instrument performance quite difficult. In the recent past, calibration rocket underflights have helped establish a calibration baseline. The EVE instrument on SDO for a time provided well-calibrated, high spectral resolution solar spectra for a broad range of the EUV, but has suffered a loss of coverage at the shorter wavelengths. NOAA's Solar UltraViolet Imager (SUVI), a solar EUV imager with similarities to SDO/AIA, will provide solar imagery over nearly an entire solar cycle. In order to maintain the scientific value of the SUVI's dataset, novel approaches to calibration are necessary. Here we demonstrate a suite of methods to cross-calibrate SUVI against other solar EUV instruments through the use of proxy solar spectra.

Fast discharge in a spherical cavity

DOE Office of Scientific and Technical Information (OSTI.GOV)

Antsiferov, P. S., E-mail: Ants@isan.troitsk.ru; Dorokhin, L. A.

2014-04-15

The work is devoted to the study of the plasma, created by a fast discharge in a spherical cavity. The discharge was driven by an inductive storage with plasma erosion opening switch (dI/dt ∼10{sup 12} A/s). The plasma was produced in a spherical cavity (alumina, 11 mm diameter). Xe, Ar, and He at the pressure 80 Pa were used as working gases. The time evolution of the spatial structure and of extreme ultraviolet (EUV) spectra of the discharge plasma was studied by means of micro channel plate detector. The discharges with Xe and Ar resulted in the stable appearance of the spherically shapedmore » plasma with the diameter about 1–3 mm. The plasma emission in the EUV region lasts ∼500 ns. The EUV spectrum of Ar discharge at the moment of maximum of the electron temperature T{sub e} contains the lines of Ar X (ionization potential 478.7 eV), that indicates a value of T{sub e} in the range 50–100 eV. The mechanism of plasma appearance can be the cumulation of the convergent spherical shock wave, generated by fast heat deposition and magnetic pressure in working media near the inner surface of the discharge volume.« less

SUMER: Solar Ultraviolet Measurements of Emitted Radiation

NASA Technical Reports Server (NTRS)

Wilhelm, K.; Axford, W. I.; Curdt, W.; Gabriel, A. H.; Grewing, M.; Huber, M. C. E.; Jordan, S. D.; Kuehne, M.; Lemaire, P.; Marsch, E.

1992-01-01

The experiment Solar Ultraviolet Measurements of Emitted Radiation (SUMER) is designed for the investigations of plasma flow characteristics, turbulence and wave motions, plasma densities and temperatures, structures and events associated with solar magnetic activity in the chromosphere, the transition zone and the corona. Specifically, SUMER will measure profiles and intensities of Extreme Ultraviolet (EUV) lines emitted in the solar atmosphere ranging from the upper chromosphere to the lower corona; determine line broadenings, spectral positions and Doppler shifts with high accuracy, provide stigmatic images of selected areas of the Sun in the EUV with high spatial, temporal and spectral resolution and obtain full images of the Sun and the inner corona in selectable EUV lines, corresponding to a temperature from 10,000 to more than 1,800,000 K.

A volume-limited survey of High Galactic latitude planetary nebulae with the Extrme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Fruscione, Antonella; Drake, Jeremy J.; Mcdonald, Kelley; Malina, Roger F.

1995-01-01

We present the results of a complete survey, at extreme-ultraviolet (EUV) wavelengths (58-234 A), of the high Galactic latitude (absolute value of b greater than or = to 20 deg) planetary nebulae (PNs) with at least one determination of the distance within 1 kpc of the Sun. The sample comprises 27 objects observed during the Extreme Ultraviolet Explorer (EUVE) all-sky survey and represents the majority of PN likely to be accessible at EUV wavelengths. Six PNs (NGC 246, NGC 1360, K1-16, LoTr 5, NGC 4361, and NGC 3587) were detected in the shortest EUV band (58-174 A). A seventh PN (NGC 6853), not included in the sample, was also detected during the survey. The emission is consistent in all cases with that of a point source and therefore most probably originates from the PN central star. Accurate EUV count rates or upper limits in the two shorter EUVE bands (centered at approximately 100 and 200 A) are given for all the sources in the sample. NGC 4361 and NGC 3587 are reported here for the first time as sources of EUV radiation. As might be expected, attenuation by the interstellar medium dominates the PN distribution in the EUV sky.

The Extreme Ultraviolet Flux of Very Low Mass Stars

NASA Astrophysics Data System (ADS)

Drake, Jeremy

2017-09-01

The X-ray and EUV emission of stars is vital for understanding the atmospheres and evolution of their planets. The coronae of dwarf stars later than M6 behave differently to those of earlier spectral types and are more X-ray dim and radio bright. Too faint to have been observed by EUVE, their EUV behavior is currently highly uncertain. We propose to observe a small sample of late M dwarfs using the off-axis HRC-S thin Al" filter that is sensitive to EUV emission in the 50-200 A range. The measured fluxes will be used to understand the amount of cooler coronal plasma present, and extend X-ray-EUV flux relations to the latest stellar types.

Plasma-assisted oxide removal from ruthenium-coated EUV optics

NASA Astrophysics Data System (ADS)

Dolgov, A.; Lee, C. J.; Bijkerk, F.; Abrikosov, A.; Krivtsun, V. M.; Lopaev, D.; Yakushev, O.; van Kampen, M.

2018-04-01

An experimental study of oxide reduction at the surface of ruthenium layers on top of multilayer mirrors and thin Ru/Si films is presented. Oxidation and reduction processes were observed under conditions close to those relevant for extreme ultraviolet lithography. The oxidized ruthenium surface was exposed to a low-temperature hydrogen plasma, similar to the plasma induced by extreme ultraviolet radiation. The experiments show that hydrogen ions are the main reducing agent. Furthermore, the addition of hydrogen radicals increases the reduction rate beyond that expected from simple flux calculations. We show that low-temperature hydrogen plasmas can be effective for reducing oxidized top surfaces. Our proof-of-concept experiments show that an in situ, EUV-generated plasma cleaning technology is feasible.

LARGE-SCALE CONTRACTION AND SUBSEQUENT DISRUPTION OF CORONAL LOOPS DURING VARIOUS PHASES OF THE M6.2 FLARE ASSOCIATED WITH THE CONFINED FLUX ROPE ERUPTION

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kushwaha, Upendra; Joshi, Bhuwan; Moon, Yong-Jae

We investigate evolutionary phases of an M6.2 flare and the associated confined eruption of a prominence. The pre-flare phase exhibits spectacular large-scale contraction of overlying extreme ultraviolet (EUV) coronal loops during which the loop system was subjected to an altitude decrease of ∼20 Mm (40% of the initial height) for an extended span of ∼30 minutes. This contraction phase is accompanied by sequential EUV brightenings associated with hard X-ray (HXR; up to 25 keV) and microwave (MW) sources from low-lying loops in the core region which together with X-ray spectra indicate strong localized heating in the source region before themore » filament activation. With the onset of the flare’s impulsive phase, we detect HXR and MW sources that exhibit intricate temporal and spatial evolution in relation to the fast rise of the prominence. Following the flare maximum, the filament eruption slowed down and subsequently became confined within the large overlying active region loops. During the confinement process of the erupting prominence, we detect MW emission from the extended coronal region with multiple emission centroids, which likely represent emission from hot blobs of plasma formed after the collapse of the expanding flux rope and entailing prominence material. RHESSI spectroscopy reveals high plasma temperature (∼30 MK) and substantial non-thermal characteristics (δ ∼ 5) during the impulsive phase of the flare. The time evolution of thermal energy exhibits a good correspondence with the variations in cumulative non-thermal energy, which suggests that the energy of accelerated particles is efficiently converted to hot flare plasma, implying an effective validation of the Neupert effect.« less

X-ray Imaging and preliminary studies of the X-ray self-emission from an innovative plasma-trap based on the Bernstein waves heating mechanism

NASA Astrophysics Data System (ADS)

Caliri, C.; Romano, F. P.; Mascali, D.; Gammino, S.; Musumarra, A.; Castro, G.; Celona, L.; Neri, L.; Altana, C.

2013-10-01

Electron Cyclotron Resonance Ion Sources (ECRIS) are based on ECR heated plasmas emitting high fluxes of X-rays. Here we illustrate a pilot study of the X-ray emission from a compact plasma-trap in which an off-resonance microwave-plasma interaction has been attempted, highlighting a possible Bernstein-Waves based heating mechanism. EBWs-heating is obtained via the inner plasma EM-to-ES wave conversion and enables to reach densities much larger than the cut-off ones. At LNS-INFN, an innovative diagnostic technique based on the design of a Pinhole Camera (PHC) coupled to a CCD device for X-ray Imaging of the plasma (XRI) has been developed, in order to integrate X-ray traditional diagnostics (XRS). The complementary use of electrostatic probes measurements and X-ray diagnostics enabled us to gain knowledge about the high energy electrons density and temperature and about the spatial structure of the source. The combination of the experimental data with appropriate modeling of the plasma-source allowed to estimate the X-ray emission intensity in different energy domains (ranging from EUV up to Hard X-rays). The use of ECRIS as X-ray source for multidisciplinary applications, is now a concrete perspective due to the intense fluxes produced by the new plasma heating mechanism.

The extreme ultraviolet explorer

NASA Technical Reports Server (NTRS)

Bowyer, Stuart; Malina, Roger F.

1990-01-01

The Extreme Ultraviolet Explorer (EUVE) mission, currently scheduled for launch in September 1991, is described. The primary purpose of the mission is to survey the celestial sphere for astronomical sources of Extreme Ultraviolet (EUV) radiation. The survey will be accomplished with the use of three EUV telescopes, each sensitive to a different segment of the EUV band. A fourth telescope will perform a high sensitivity search of a limited sample of the sky in the shortest wavelength bands. The all sky survey will be carried out in the first six months of the mission and will be made in four bands, or colors. The second phase of the mission, conducted entirely by guest observers selected by NASA, will be devoted to spectroscopic observations of EUV sources. The performance of the instrument components is described. An end to end model of the mission, from a stellar source to the resulting scientific data, was constructed. Hypothetical data from astronomical sources processed through this model are shown.

Enabling laboratory EUV research with a compact exposure tool

NASA Astrophysics Data System (ADS)

Brose, Sascha; Danylyuk, Serhiy; Tempeler, Jenny; Kim, Hyun-su; Loosen, Peter; Juschkin, Larissa

2016-03-01

In this work we present the capabilities of the designed and realized extreme ultraviolet laboratory exposure tool (EUVLET) which has been developed at the RWTH-Aachen, Chair for the Technology of Optical Systems (TOS), in cooperation with the Fraunhofer Institute for Laser Technology (ILT) and Bruker ASC GmbH. Main purpose of this laboratory setup is the direct application in research facilities and companies with small batch production, where the fabrication of high resolution periodic arrays over large areas is required. The setup can also be utilized for resist characterization and evaluation of its pre- and post-exposure processing. The tool utilizes a partially coherent discharge produced plasma (DPP) source and minimizes the number of other critical components to a transmission grating, the photoresist coated wafer and the positioning system for wafer and grating and utilizes the Talbot lithography approach. To identify the limits of this approach first each component is analyzed and optimized separately and relations between these components are identified. The EUV source has been optimized to achieve the best values for spatial and temporal coherence. Phase-shifting and amplitude transmission gratings have been fabricated and exposed. Several commercially available electron beam resists and one EUV resist have been characterized by open frame exposures to determine their contrast under EUV radiation. Cold development procedure has been performed to further increase the resist contrast. By analyzing the exposure results it can be demonstrated that only a 1:1 copy of the mask structure can be fully resolved by the utilization of amplitude masks. The utilized phase-shift masks offer higher 1st order diffraction efficiency and allow a demagnification of the mask structure in the achromatic Talbot plane.

LASER APPLICATIONS AND OTHER TOPICS IN QUANTUM ELECTRONICS: Laser-induced extreme UV radiation sources for manufacturing next-generation integrated circuits

NASA Astrophysics Data System (ADS)

Borisov, V. M.; Vinokhodov, A. Yu; Ivanov, A. S.; Kiryukhin, Yu B.; Mishchenko, V. A.; Prokof'ev, A. V.; Khristoforov, O. B.

2009-10-01

The development of high-power discharge sources emitting in the 13.5±0.135-nm spectral band is of current interest because they are promising for applications in industrial EUV (extreme ultraviolet) lithography for manufacturing integrated circuits according to technological precision standards of 22 nm and smaller. The parameters of EUV sources based on a laser-induced discharge in tin vapours between rotating disc electrodes are investigated. The properties of the discharge initiation by laser radiation at different wavelengths are established and the laser pulse parameters providing the maximum energy characteristics of the EUV source are determined. The EUV source developed in the study emits an average power of 276 W in the 13.5±0.135-nm spectral band on conversion to the solid angle 2π sr in the stationary regime at a pulse repetition rate of 3000 Hz.

Intense X-ray and EUV light source

DOEpatents

Coleman, Joshua; Ekdahl, Carl; Oertel, John

2017-06-20

An intense X-ray or EUV light source may be driven by the Smith-Purcell effect. The intense light source may utilize intense electron beams and Bragg crystals. This may allow the intense light source to range from the extreme UV range up to the hard X-ray range.

Critical illumination condenser for x-ray lithography

DOEpatents

Cohen, S.J.; Seppala, L.G.

1998-04-07

A critical illumination condenser system is disclosed, particularly adapted for use in extreme ultraviolet (EUV) projection lithography based on a ring field imaging system and a laser produced plasma source. The system uses three spherical mirrors and is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. The angles of radiation incident upon each mirror of the critical illumination condenser vary by less than eight (8) degrees. For example, the imaging system in which the critical illumination condenser is utilized has a 200 {micro}m source and requires a magnification of 26. The three spherical mirror system constitutes a two mirror inverse Cassegrain, or Schwarzschild configuration, with a 25% area obstruction (50% linear obstruction). The third mirror provides the final pupil and image relay. The mirrors include a multilayer reflective coating which is reflective over a narrow bandwidth. 6 figs.

Critical illumination condenser for x-ray lithography

DOEpatents

Cohen, Simon J.; Seppala, Lynn G.

1998-01-01

A critical illumination condenser system, particularly adapted for use in extreme ultraviolet (EUV) projection lithography based on a ring field imaging system and a laser produced plasma source. The system uses three spherical mirrors and is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. The angles of radiation incident upon each mirror of the critical illumination condenser vary by less than eight (8) degrees. For example, the imaging system in which the critical illumination condenser is utilized has a 200 .mu.m source and requires a magnification of 26.times.. The three spherical mirror system constitutes a two mirror inverse Cassegrain, or Schwarzschild configuration, with a 25% area obstruction (50% linear obstruction). The third mirror provides the final pupil and image relay. The mirrors include a multilayer reflective coating which is reflective over a narrow bandwidth.

Eruption of a plasma blob, associated M-class flare, and large-scale extreme-ultraviolet wave observed by SDO

NASA Astrophysics Data System (ADS)

Kumar, P.; Manoharan, P. K.

2013-05-01

We present a multiwavelength study of the formation and ejection of a plasma blob and associated extreme ultraviolet (EUV) waves in active region (AR) NOAA 11176, observed by SDO/AIA and STEREO on 25 March 2011. The EUV images observed with the AIA instrument clearly show the formation and ejection of a plasma blob from the lower atmosphere of the Sun at ~9 min prior to the onset of the M1.0 flare. This onset of the M-class flare happened at the site of the blob formation, while the blob was rising in a parabolic path with an average speed of ~300 km s. The blob also showed twisting and de-twisting motion in the lower corona, and the blob speed varied from ~10-540 km s. The faster and slower EUV wavefronts were observed in front of the plasma blob during its impulsive acceleration phase. The faster EUV wave propagated with a speed of ~785 to 1020 km s, whereas the slower wavefront speed varied in between ~245 and 465 km s. The timing and speed of the faster wave match the shock speed estimated from the drift rate of the associated type II radio burst. The faster wave experiences a reflection by the nearby AR NOAA 11177. In addition, secondary waves were observed (only in the 171 Å channel), when the primary fast wave and plasma blob impacted the funnel-shaped coronal loops. The Helioseismic Magnetic Imager (HMI) magnetograms revealed the continuous emergence of new magnetic flux along with shear flows at the site of the blob formation. It is inferred that the emergence of twisted magnetic fields in the form of arch-filaments/"anemone-type" loops is the likely cause for the plasma blob formation and associated eruption along with the triggering of M-class flare. Furthermore, the faster EUV wave formed ahead of the blob shows the signature of fast-mode MHD wave, whereas the slower wave seems to be generated by the field line compression by the plasma blob. The secondary wave trains originated from the funnel-shaped loops are probably the fast magnetoacoustic waves. Three movies are available in electronic form at http://www.aanda.org

The Extreme Ultraviolet Explorer Mission

NASA Technical Reports Server (NTRS)

Bowyer, S.; Malina, R. F.

1991-01-01

The Extreme Ultraviolet Explorer (EUVE) mission, currently scheduled from launch in September 1991, is described. The primary purpose of the mission is to survey the celestial sphere for astronomical sources of extreme ultraviolet (EUV) radiation with the use of three EUV telescope, each sensitive to a different segment of the EUV band. A fourth telescope is planned to perform a high-sensitivity search of a limited sample of the sky in the shortest wavelength bands. The all-sky survey is planned to be carried out in the first six months of the mission in four bands, or colors, 70-180 A, 170-250 A, 400-600 A, and 500-700 A. The second phase of the mission is devoted to spectroscopic observations of EUV sources. A high-efficiency grazing-incidence spectrometer using variable line-space gratings is planned to provide spectral data with about 1-A resolution. An end-to-end model of the mission, from a stellar source to the resulting scientific data, is presented. Hypothetical data from astronomical sources were processed through this model and are shown.

Web-based Tool Suite for Plasmasphere Information Discovery

NASA Astrophysics Data System (ADS)

Newman, T. S.; Wang, C.; Gallagher, D. L.

2005-12-01

A suite of tools that enable discovery of terrestrial plasmasphere characteristics from NASA IMAGE Extreme Ultra Violet (EUV) images is described. The tool suite is web-accessible, allowing easy remote access without the need for any software installation on the user's computer. The features supported by the tool include reconstruction of the plasmasphere plasma density distribution from a short sequence of EUV images, semi-automated selection of the plasmapause boundary in an EUV image, and mapping of the selected boundary to the geomagnetic equatorial plane. EUV image upload and result download is also supported. The tool suite's plasmapause mapping feature is achieved via the Roelof and Skinner (2000) Edge Algorithm. The plasma density reconstruction is achieved through a tomographic technique that exploits physical constraints to allow for a moderate resolution result. The tool suite's software architecture uses Java Server Pages (JSP) and Java Applets on the front side for user-software interaction and Java Servlets on the server side for task execution. The compute-intensive components of the tool suite are implemented in C++ and invoked by the server via Java Native Interface (JNI).

The Geminga Pulsar: Soft X-Ray Variability and an EUVE Observation

NASA Technical Reports Server (NTRS)

Halpern, Jules P.; Martin, Christopher; Marshall, Herman L.; Oliversen, Ronald (Technical Monitor)

2001-01-01

We observed the Geminga pulsar with the EUVE satellite, detecting pulsed emission in the Deep Survey imager. Joint spectral fits of the EUVE flux with ROSAT PSPC data are consistent with thermal plus power-law models in which the thermal component makes the dominant contribution to the soft X-ray flux seen by EUVE and ROSAT. The data are consistent with blackbody emission of T = (4 - 6) x 10(exp 5) K over most of the surface of the star at the measured parallax distance of 160 pc. Although model atmospheres are more realistic, and can fit the data with effective temperatures a factor of 2 lower, current data would not discriminate between these and blackbody models. We also find evidence for variability of Geminga's soft X-ray pulse shape. Narrow dips in the light curve that were present in 1991 had largely disappeared in 1993/1994, causing the pulsed fraction to decline from 32% to 18%. If the dips are attributed to cyclotron resonance scattering by an e1 plasma on closed magnetic field lines, then the process that resupplies that plasma must be variable.

The Geminga Pulsar: Soft X-Ray Variability and an EUVE Observation

NASA Technical Reports Server (NTRS)

Halpern, Jules P.; Martin, Christopher; Marshall, Herman L.

1996-01-01

We observed the Geminga pulsar with the EUVE satellite, detecting pulsed emission in the Deep Survey imager. Joint spectral fits of the EUVE flux with ROSAT PSPC data are consistent with thermal plus power-law models in which the thermal component makes the dominant contribution to the soft X-ray flux seen by EUVE and ROSAT. The data are consistent with blackbody emission of T = (4-6) x 10(exp 5) K over most of the surface of the star at the measured parallax distance of 160 pc. Although model atmospheres are more realistic, and can fit the data with effective temperatures a factor of 2 lower, current data would not discriminate between these and blackbody models. We also find evidence for variability of Geminga's soft X-ray pulse shape. Narrow dips in the light curve that were present in 1991 had largely disappeared in 1993/1994, causing the pulsed fraction to decline from 32% to 18%. If the dips are attributed to cyclotron resonance scattering by an e(+/-) plasma on closed magnetic field lines, then the process that resupplies that plasma must be variable.

A hemispherical Langmuir probe array detector for angular resolved measurements on droplet-based laser-produced plasmas

DOE Office of Scientific and Technical Information (OSTI.GOV)

Gambino, Nadia, E-mail: gambinon@ethz.ch; Brandstätter, Markus; Rollinger, Bob

2014-09-15

In this work, a new diagnostic tool for laser-produced plasmas (LPPs) is presented. The detector is based on a multiple array of six motorized Langmuir probes. It allows to measure the dynamics of a LPP in terms of charged particles detection with particular attention to droplet-based LPP sources for EUV lithography. The system design permits to temporally resolve the angular and radial plasma charge distribution and to obtain a hemispherical mapping of the ions and electrons around the droplet plasma. The understanding of these dynamics is fundamental to improve the debris mitigation techniques for droplet-based LPP sources. The device hasmore » been developed, built, and employed at the Laboratory for Energy Conversion, ETH Zürich. The experimental results have been obtained on the droplet-based LPP source ALPS II. For the first time, 2D mappings of the ion kinetic energy distribution around the droplet plasma have been obtained with an array of multiple Langmuir probes. These measurements show an anisotropic expansion of the ions in terms of kinetic energy and amount of ion charge around the droplet target. First estimations of the plasma density and electron temperature were also obtained from the analysis of the probe current signals.« less

Improvements in the EQ-10 electrodeless Z-pinch EUV source for metrology applications

NASA Astrophysics Data System (ADS)

Horne, Stephen F.; Gustafson, Deborah; Partlow, Matthew J.; Besen, Matthew M.; Smith, Donald K.; Blackborow, Paul A.

2011-04-01

Now that EUV lithography systems are beginning to ship into the fabs for next generation chips it is more critical that the EUV infrastructure developments are keeping pace. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinch™ light source since 2005. The source is currently being used for metrology, mask inspection, and resist development. These applications require especially stable performance in both power and source size. Over the last 5 years Energetiq has made many source modifications which have included better thermal management as well as high pulse rate operation6. Recently we have further increased the system power handling and electrical pulse reproducibility. The impact of these modifications on source performance will be reported.

Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam

DOE Office of Scientific and Technical Information (OSTI.GOV)

Oyama, Tomoko Gowa, E-mail: ohyama.tomoko@qst.go.jp; Oshima, Akihiro; Tagawa, Seiichi, E-mail: tagawa@sanken.osaka-u.ac.jp

2016-08-15

It is a challenge to obtain sufficient extreme ultraviolet (EUV) exposure time for fundamental research on developing a new class of high sensitivity resists for extreme ultraviolet lithography (EUVL) because there are few EUV exposure tools that are very expensive. In this paper, we introduce an easy method for predicting EUV resist sensitivity by using conventional electron beam (EB) sources. If the chemical reactions induced by two ionizing sources (EB and EUV) are the same, the required absorbed energies corresponding to each required exposure dose (sensitivity) for the EB and EUV would be almost equivalent. Based on this theory, wemore » calculated the resist sensitivities for the EUV/soft X-ray region. The estimated sensitivities were found to be comparable to the experimentally obtained sensitivities. It was concluded that EB is a very useful exposure tool that accelerates the development of new resists and sensitivity enhancement processes for 13.5 nm EUVL and 6.x nm beyond-EUVL (BEUVL).« less

Tether-Cutting Energetics of a Solar Quiet Region Prominence Eruption

NASA Technical Reports Server (NTRS)

Sterling, Alphonse C.; Moore, Ronald L.

2003-01-01

We study the morphology and energetics of a slowly evolving quiet-region solar prominence eruption occurring on 1999 February 8-9 in the solar north polar crown region, using soft X-ray data from the soft X-ray telescope (SXT) on Yohkoh and Fexv EUV 284 Angstrom data from the EUV Imaging Telescope (EIT) on the Solar and Heliospheric Observatory (SOHO). After rising at approximately equal to l kilometer per second for about six hours, the prominence accelerates to a velocity of approximately equal to 10 kilometers per second, leaving behind EUV and soft X-ray loop arcades of a weak flare in its source region. Intensity dimmings occur in the eruption region cospatially in EUV and soft X-rays, indicating that the dimmings result from a depletion of material. Over the first two hours of the prominences rapid rise, flare-like brightenings occur beneath the rising prominence that might correspond to tether-cutting magnetic reconnection. These brightenings have heating requirements of up to approximately 10(exp 28)-10(exp 29) ergs, and this is comparable to the mechanical energy required for the rising prominence over the same time period. If the ratio of mechanical energy to heating energy remains constant through the early phase of the eruption, then we infer that coronal signatures for the tether cutting may not be apparent at or shortly after the start of the fast phase in this or similar low-energy eruptions, since the plasma-heating energy levels would not exceed that of the background corona.

Tether-Cutting Energetics of a Solar Quiet Region Prominence Eruption

NASA Technical Reports Server (NTRS)

Sterling, Alphonse C.; Moore, Ronald L.

2003-01-01

We study the morphology and energetics of a slowly-evolving quiet region solar prominence eruption occurring on 1999 February 8-9 in the solar north polar crown region, using soft X-ray data from the soft X-ray telescope (SXT) on Yohkoh and Fe xv EUV 284 A data from the EUV Imaging Telescope (EIT) on SOHO. After rising at approx. 1 km/s for about six hours, the prominence accelerates to a velocity of approx. 10 km/s, leaving behind EUV and soft X-ray loop arcades of a weak flare in its source region. Intensity dimmings occur in the eruption region cospatially in EUV and soft X-rays, indicating that the dimmings result from a depletion of material. Over the first two hours of the prominence s rapid rise, flare-like brightenings occur beneath the rising prominence which may correspond to "tether cutting" magnetic reconnection. These brightenings have heating requirements of up to approx. 10(exp 28)-10(exp 29) ergs, and this is comparable to the mechanical energy required for the rising prominence over the same time period. If the ratio of mechanical energy to heating energy remains constant through the early phase of the eruption, then we infer that coronal signatures for the tether cutting may not be apparent at or shortly after the start of the fast phase in this or similar low-energy eruptions, since the plasma-heating energy levels would not exceed that of the background corona.

Toward compact and ultra-intense laser driven soft x-ray lasers (Conference Presentation)

NASA Astrophysics Data System (ADS)

Sebban, Stéphane

2017-05-01

We report here recent work on an optical-field ionized (OFI), high-order harmonic-seeded EUV laser. The amplifying medium is a plasma of nickel-like krypton obtained by optical field ionization focusing a 1 J, 30 fs, circularly- polarized, infrared pulse into a krypton-filled gas cell or krypton gas jet. The lasing transition is the 3d94p (J=0) --> 3d94p (J=1) transition of Ni-like krypton ions at 32.8 nm and is pumped by collisions with hot electrons. The polarization of the HH-seeded EUV laser beam was studied using an analyzer composed of three grazing incidence EUV multilayer mirrors able to spin under vacuum. For linear polarization, the Malus law has been recovered while in the case of a circularly-polarized seed, the EUV signal is insensitive to the rotation of the analyzer, bearing testimony to circularly polarized. The gain dynamics was probed by seeding the amplifier with a high-order harmonic pulse at different delays. The gain duration monotonically decreased from 7 ps to an unprecedented shortness of 450 fs FWHM as the amplification peak rose from 150 to 1,200 with an increase of the plasma density from 3 × 1018 cm-3 up to 1.2 × 1020 cm-3. The integrated energy of the EUV laser pulse was also measured, and found to be around 2 μJ. It is to be noted that in the ASE mode, longer amplifiers were achieved (up to 3 cm), yielding EUV outputs up to 14 μJ.

Imaging performance improvement of coherent extreme-ultraviolet scatterometry microscope with high-harmonic-generation extreme-ultraviolet source

NASA Astrophysics Data System (ADS)

Mamezaki, Daiki; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo

2017-06-01

In extreme-ultraviolet (EUV) lithography, the development of a review apparatus for the EUV mask pattern at an exposure wavelength of 13.5 nm is required. The EUV mask is composed of an absorber pattern and a Mo/Si multilayer on a glass substrate. This mask pattern has a three-dimensional (3D) structure. The 3D structure would modulate the EUV reflection phase, which would cause focus and pattern shifts. Thus, the review of the EUV phase image is also important. We have developed a coherent EUV scatterometry microscope (CSM), which is a simple microscope without objective optics. The EUV phase and intensity images were reconstructed with diffraction images by ptychography. For a standalone mask review, the high-harmonic-generation (HHG) EUV source was employed. In this study, we updated the sample stage, pump-laser reduction system, and gas-pressure control system to reconstruct the image. As a result, an 88 nm line-and-space pattern and a cross-line pattern were reconstructed. In addition, a particle defect of 2 µm diameter was well reconstructed. This demonstrated the high capability of the standalone CSM, which can hence be used in factories, such as mask shops and semiconductor fabrication plants.

Development of a EUV Test Facility at the Marshall Space Flight Center

NASA Technical Reports Server (NTRS)

West, Edward; Pavelitz, Steve; Kobayashi, Ken; Robinson, Brian; Cirtain, Johnathan; Gaskin, Jessica; Winebarger, Amy

2011-01-01

This paper will describe a new EUV test facility that is being developed at the Marshall Space Flight Center (MSFC) to test EUV telescopes. Two flight programs, HiC - high resolution coronal imager (sounding rocket) and SUVI - Solar Ultraviolet Imager (GOES-R), set the requirements for this new facility. This paper will discuss those requirements, the EUV source characteristics, the wavelength resolution that is expected and the vacuum chambers (Stray Light Facility, Xray Calibration Facility and the EUV test chamber) where this facility will be used.

Strong non-radial propagation of energetic electrons in solar corona

NASA Astrophysics Data System (ADS)

Klassen, A.; Dresing, N.; Gómez-Herrero, R.; Heber, B.; Veronig, A.

2018-06-01

Analyzing the sequence of solar energetic electron events measured at both STEREO-A (STA) and STEREO-B (STB) spacecraft during 17-21 July 2014, when their orbital separation was 34°, we found evidence of a strong non-radial electron propagation in the solar corona below the solar wind source surface. The impulsive electron events were associated with recurrent flare and jet (hereafter flare/jet) activity at the border of an isolated coronal hole situated close to the solar equator. We have focused our study on the solar energetic particle (SEP) event on 17 July 2014, during which both spacecraft detected a similar impulsive and anisotropic energetic electron event suggesting optimal connection of both spacecraft to the parent particle source, despite the large angular separation between the parent flare and the nominal magnetic footpoints on the source surface of STA and STB of 68° and 90°, respectively. Combining the remote-sensing extreme ultraviolet (EUV) observations, in-situ plasma, magnetic field, and energetic particle data we investigated and discuss here the origin and the propagation trajectory of energetic electrons in the solar corona. We find that the energetic electrons in the energy range of 55-195 keV together with the associated EUV jet were injected from the flare site toward the spacecraft's magnetic footpoints and propagate along a strongly non-radial and inclined magnetic field below the source surface. From stereoscopic (EUV) observations we estimated the inclination angle of the jet trajectory and the respective magnetic field of 63° ± 11° relative to the radial direction. We show how the flare accelerated electrons reach very distant longitudes in the heliosphere, when the spacecraft are nominally not connected to the particle source. This example illustrates how ballistic backmapping can occasionally fail to characterize the magnetic connectivity during SEP events. This finding also provides an additional mechanism (one among others), which may explain the origin of widespread SEP events.

Mask fabrication and its applications to extreme ultra-violet diffractive optics

NASA Astrophysics Data System (ADS)

Cheng, Yang-Chun

Short-wavelength radiation around 13nm of wavelength (Extreme Ultra-Violet, EUV) is being considered for patterning microcircuits, and other electronic chips with dimensions in the nanometer range. Interferometric Lithography (IL) uses two beams of radiation to form high-resolution interference fringes, as small as half the wavelength of the radiation used. As a preliminary step toward manufacturing technology, IL can be used to study the imaging properties of materials in a wide spectral range and at nanoscale dimensions. A simple implementation of IL uses two transmission diffraction gratings to form the interference pattern. More complex interference patterns can be created by using different types of transmission gratings. In this thesis, I describe the development of a EUV lithography system that uses diffractive optical elements (DOEs), from simple gratings to holographic structures. The exposure system is setup on a EUV undulator beamline at the Synchrotron Radiation Center, in the Center for NanoTechnology clean room. The setup of the EUV exposure system is relatively simple, while the design and fabrication of the DOE "mask" is complex, and relies on advanced nanofabrication techniques. The EUV interferometric lithography provides reliable EUV exposures of line/space patterns and is ideal for the development of EUV resist technology. In this thesis I explore the fabrication of these DOE for the EUV range, and discuss the processes I have developed for the fabrication of ultra-thin membranes. In addition, I discuss EUV holographic lithography and generalized Talbot imaging techniques to extend the capability of our EUV-IL system to pattern arbitrary shapes, using more coherent sources than the undulator. In a series of experiments, we have demonstrated the use of a soft X-ray (EUV) laser as effective source for EUV lithography. EUV-IL, as implemented at CNTech, is being used by several companies and research organizations to characterize photoresist materials.

Non-Potential Magnetic Fields and Magnetic Reconnection In Low Collisional Plasmas-Discovery of Solar EUV Mini-Sigmoids and Development of Novel In-Space Propulsion Systems

NASA Astrophysics Data System (ADS)

Chesny, David

Magnetic reconnection is the source of many of the most powerful explosions of astrophysical plasmas in the universe. Blazars, magnetars, stellar atmospheres, and planetary magnetic fields have all been shown to be primary sites of strong reconnection events. For studying the fundamental physics behind this process, the solar atmosphere is our most accessible laboratory setting. Magnetic reconnection resulting from non-potential fields leads to plasma heating and particle acceleration, often in the form of explosive activity, contributing to coronal heating and the solar wind. Large-scale non-potential (sigmoid) fields in the solar atmosphere are poorly understood due to their crowded neighborhoods. For the first time, small-scale, non-potential loop structures have been observed in quiet Sun EUV observations. Fourteen unique mini-sigmoid events and three diffuse non-potential loops have been discovered, suggesting a multi-scaled self-similarity in the sigmoid formation process. These events are on the order of 10 arcseconds in length and do not appear in X-ray emissions, where large-scale sigmoids are well documented. We have discovered the first evidence of sigmoidal structuring in EUV bright point phenomena, which are prolific events in the solar atmosphere. Observations of these mini-sigmoids suggest that they are being formed via tether-cutting reconnection, a process observed to occur at active region scales. Thus, tether-cutting is suggested to be ubiquitous throughout the solar atmosphere. These dynamics are shown to be a function of the free magnetic energy in the quiet Sun network. Recently, the reconnection process has been reproduced in Earth-based laboratory tokamaks. Easily achievable magnetic field configurations can induce reconnection and result in ion acceleration. Here, magnetic reconnection is utilized as the plasma acceleration mechanism for a theoretical propulsion system. The theory of torsional spine reconnection is shown to result in ion velocities of > 3000 km s-1 and thrusts on the order of 3-15 N. As current in-use ion propulsion technology can only achieve ˜ 30 km s-1, the proposed design can substantially increase thrust on a spacecraft and provide for fast manned interplanetary travel.

Using Global Total Electron Content to Understand Interminimum Changes in Solar EUV Irradiance and Thermospheric Composition

NASA Astrophysics Data System (ADS)

McDonald, S. E.; Emmert, J. T.; Krall, J.; Mannucci, A. J.; Vergados, P.

2017-12-01

To understand how and why the distribution of geospace plasma in the ionosphere/plasmasphere is evolving over multi-decadal time scales in response to solar, heliospheric and atmospheric forcing, it is critically important to have long-term, stable datasets. In this study, we use a newly constructed dataset of GPS-based total electron content (TEC) developed by JPL. The JPL Global Ionosphere Mapping (GIM) algorithm was used to generate a 35-station dataset spanning two solar minimum periods (1993-2014). We also use altimeter-derived TEC measurements from TOPEX-Poseidon and Jason-1 to construct a continuous dataset for the 1995-2014 time period. Both longterm datasets are compared to each other to study interminimum changes in the global TEC (during 1995-1995 and 2008-2009). We use the SAMI3 physics-based model of the ionosphere to compare the simulations of 1995-2014 with the JPL TEC and TOPEX/Jason-1 datasets. To drive SAMI3, we use the Naval Research Laboratory Solar Spectral Irradiance (NRLSSI) model to specify the EUV irradiances, and NRLMSIS to specify the thermosphere. We adjust the EUV irradiances and thermospheric constituents to match the TEC datasets and draw conclusions regarding sources of the differences between the two solar minimum periods.

International Space Station Columbus Payload SoLACES Degradation Assessment

NASA Technical Reports Server (NTRS)

Harman, William; Schmidl, William; Mikatarian, Ron; Soares, Carlos; Schmidtke, Gerhard; Erhardt, Christian

2014-01-01

SOLAR is a European Space Agency (ESA) payload deployed on the International Space Station (ISS) and located on the Columbus Laboratory. It is located on the Columbus External Payload Facility in a zenith location. The objective of the SOLAR payload is to study the Sun. The SOLAR payload consists of three instruments that allow for measurement of virtually the entire electromagnetic spectrum (17 nm to 100 um). The three payload instruments are SOVIM (SOlar Variable and Irradiance Monitor), SOLSPEC (SOLar SPECctral Irradiance measurements), and SolACES (SOLar Auto-Calibrating Extreme UV/UV Spectrophotometers). The SolACES payload includes a set of 4 spectrometers that measure the solar EUV flux from 17 nm to 220 nm. One of these 4 spectrometers failed early on (before deployment). EUV data is important in understanding the solar dynamo. Also, EUV flux is the source of most of the ionization that produces the ionosphere plasma. Plasma production is important in understanding the ionosphere environment. The ionosphere conditions affect many subjects including spacecraft charging, dynamo processes, instabilities, and communications. The 3 remaining spectrometers have collected valuable data during the historically low solar cycle 24. Some of this data will be presented. A significant trend in degradation of the remaining SolACES spectrometers was observed towards the end of CY2010 (GMT 310) through mid CY 2011 (GMT 132). The Principle Investigators of SolACES initiated a Mission Evaluation Room (MER) Chit to request an investigation of the degradation in CY 2011 (GMT 230). The Boeing Space Environments team was asked to respond to the ESA initiated MER Chit request to investigate the cause of the degradation. This paper will discuss the findings of that investigation.

Calibration techniques and results in the soft X-ray and extreme ultraviolet for components of the Extreme Ultraviolet Explorer Satellite

NASA Technical Reports Server (NTRS)

Malina, Roger F.; Jelinsky, Patrick; Bowyer, Stuart

1986-01-01

The calibration facilities and techniques for the Extreme Ultraviolet Explorer (EUVE) from 44 to 2500 A are described. Key elements include newly designed radiation sources and a collimated monochromatic EUV beam. Sample results for the calibration of the EUVE filters, detectors, gratings, collimators, and optics are summarized.

Continued Analysis of EUVE Solar System Observations

NASA Technical Reports Server (NTRS)

Gladstone, G. Randall

2001-01-01

This is the final report for this project. We proposed to continue our work on extracting important results from the EUVE (Extreme UltraViolet Explorer) archive of lunar and jovian system observations. In particular, we planned to: (1) produce several monochromatic images of the Moon at the wavelengths of the brightest solar EUV emission lines; (2) search for evidence of soft X-ray emissions from the Moon and/or X-ray fluorescence at specific EUV wavelengths; (3) search for localized EUV and soft X-ray emissions associated with each of the Galilean satellites; (4) search for correlations between localized Io Plasma Torus (IPT) brightness and volcanic activity on Io; (5) search for soft X-ray emissions from Jupiter; and (6) determine the long term variability of He 58.4 nm emissions from Jupiter, and relate these to solar variability. However, the ADP review panel suggested that the work concentrate on the Jupiter/IPT observations, and provided half the requested funding. Thus we have performed no work on the first two tasks, and instead concentrated on the last three. In addition we used funds from this project to support reduction and analysis of EUVE observations of Venus. While this was not part of the original statement of work, it is entirely in keeping with extracting important results from EUVE solar system observations.

EUV via hole pattern fidelity enhancement through novel resist and post-litho plasma treatment

NASA Astrophysics Data System (ADS)

Yaegashi, Hidetami; Koike, Kyohei; Fonseca, Carlos; Yamashita, Fumiko; Kaushik, Kumar; Morikita, Shinya; Ito, Kiyohito; Yoshimura, Shota; Timoshkov, Vadim; Maslow, Mark; Jee, Tae Kwon; Reijnen, Liesbeth; Choi, Peter; Feng, Mu; Spence, Chris; Schoofs, Stijn

2018-03-01

Extreme UV(EUV) technology must be potential solution for sustainable scaling, and its adoption in high volume manufacturing(HVM) is getting realistic more and more. This technology has a wide capability to mitigate various technical problem in Multi-patterning (LELELE) for via hole patterning with 193-i. It induced local pattern fidelity error such like CDU, CER, Pattern placement error. Exactly, EUV must be desirable scaling-driving tool, however, specific technical issue, named RLS (Resolution-LER-Sensitivity) triangle, obvious remaining issue. In this work, we examined hole patterning sensitizing (Lower dose approach) utilizing hole patterning restoration technique named "CD-Healing" as post-Litho. treatment.

EUV nanosecond laser ablation of silicon carbide, tungsten and molybdenum

NASA Astrophysics Data System (ADS)

Frolov, Oleksandr; Kolacek, Karel; Schmidt, Jiri; Straus, Jaroslav; Choukourov, Andrei; Kasuya, Koichi

2015-09-01

In this paper we present results of study interaction of nanosecond EUV laser pulses at wavelength of 46.9 nm with silicon carbide (SiC), tungsten (W) and molybdenum (Mo). As a source of laser radiation was used discharge-plasma driver CAPEX (CAPillary EXperiment) based on high current capillary discharge in argon. The laser beam is focused with a spherical Si/Sc multilayer-coated mirror on samples. Experimental study has been performed with 1, 5, 10, 20 and 50 laser pulses ablation of SiC, W and Mo at various fluence values. Firstly, sample surface modification in the nanosecond time scale have been registered by optical microscope. And the secondly, laser beam footprints on the samples have been analyzed by atomic-force microscope (AFM). This work supported by the Czech Science Foundation under Contract GA14-29772S and by the Grant Agency of the Ministry of Education, Youth and Sports of the Czech Republic under Contract LG13029.

Plasmas in compact traps: From ion sources to multidisciplinary research

NASA Astrophysics Data System (ADS)

Mascali, D.; Musumarra, A.; Leone, F.; Galatà, A.; Romano, F. P.; Gammino, S.

2017-09-01

In linear (minimum-B) magneto-static traps dense and hot plasmas are heated by electromagnetic radiation in the GHz domain via the Electron Cyclotron Resonance (ECR). The values of plasma density, temperature and confinement times ( n_eτ_i>10^{13} cm ^{-3} s; T_e>10 keV) are similar to the ones of thermonuclear plasmas. The research in this field -devoted to heating and confinement optimization- has been supported by numerical modeling and advanced diagnostics, for probing the plasma especially in a non-invasive way. ECR-based systems are nowadays able to produce extremely intense (tens or hundreds of mA) beams of light ions (p, d, He), and relevant currents of heavier elements (C, O, N) up to heavy ions like Xe, Pb, U. Such beams can be extracted from the trap by a proper electrostatic system. The above-mentioned properties make these plasmas very attractive for interdisciplinary researches also, such as i) nuclear decays rates measurements in stellar-like conditions, ii) energy conversion studies, being exceptional sources of short-wavelength electromagnetic radiation (EUV, X-rays, hard X-rays and gammas, useful in material science and archaeometry), iii) environments allowing precise spectroscopical measurements as benchmarks for magnetized astrophysical plasmas. The talk will give an overview about the state-of-the-art in the field of intense ion sources, and some new perspectives for interdisciplinary research, with a special attention to the developments based at INFN-LNS.

Investigation of plasma-induced erosion of multilayer condenser optics

NASA Astrophysics Data System (ADS)

Anderson, Richard J.; Buchenauer, Dean A.; Williams, K. A.; Clift, W. M.; Klebanoff, L. E.; Edwards, N. V.; Wood, O. R., II; Wurm, S.

2005-05-01

Experiments are presented that investigate the mechanistic cause of multilayer erosion observed from condenser optics exposed to EUV laser-produced plasma (LPP) sources. Using a Xe filament jet source excited with Nd-YAG laser radiation (300 mJ/pulse), measurements were made of material erosion from Au, Mo, Si and C using coated quartz microbalances located 127 mm from the plasma. The observed erosion rates were as follows: Au=99nm/106 shots, Mo= 26nm/106 shots, Si=19nm/106 shots, and C=6nm/106 shots. The relative ratio Au:Mo:Si:C of erosion rates observed experimentally, 16:4:3:1 compares favorably with that predicted from an atomic sputtering model assuming 20 kV Xe ions, 16:6:4:1. The relative agreement indicates that Xe-substrate sputtering is largely responsible for the erosion of Mo/Si multilayers on condenser optics that directly face the plasma. Time-of-flight Faraday cup measurements reveal the emission of high energy Xe ions from the Xe-filament jet plasma. The erosion rate does not depend on the repetition rate of the laser, suggesting a thermal mechanism is not operative. The Xe-filament jet erosion is ~20x that observed from a Xe spray jet. Since the long-lived (millisecond time scale) plasma emanating from these two sources are the same to within ~30%, sputtering from this long-lived plasma can be ruled out as an erosion agent.

EUV emission stimulated by use of dual laser pulses from continus liquid microjet targets

NASA Astrophysics Data System (ADS)

Higashiguchi, Takeshi; Rajyaguru, Chirag; Sasaki, Wataru; Kubodera, Shoichi

2004-11-01

A continuous water-jet or water-jet mixed with LiF with several tens μm diameter was formed in a vacuum chamber through a small capillary nozzle. Usage of two laser pulses is an efficient way to produce EUV emission, since a density and temperature of a plasma formed by the first laser pulse are regulated by the second laser pulse. By adjusting the delay of the second pulse, one could maximize the EUV emission. A subpicosecond Ti:Sapphire laser at a wavelength of 800 nm produced a maximum energy around 30 mJ. The beam was divided by a Michelson interferometer, which produced two laser pulses with energies of 5 mJ. The pulse duration was adjusted around 300 fs (FWHM). Both beams were focused on a micro-jet using a lens with a focal length of 15 cm. The delay time between the two pulses was varied from 100 to 800 ps by use of an optical delay line. Clear enhancement of the EUV emission yield was observed when the delay between the two pulses was around 500 ps. The experimentally observed delay agrees reasonably well with that of a plasma to expand to its critical density of 10^21 cm-3.

EUV wavefront metrology system in EUVA

NASA Astrophysics Data System (ADS)

Hasegawa, Takayuki; Ouchi, Chidane; Hasegawa, Masanobu; Kato, Seima; Suzuki, Akiyoshi; Sugisaki, Katsumi; Murakami, Katsuhiko; Saito, Jun; Niibe, Masahito

2004-05-01

An Experimental extreme ultraviolet (EUV) interferometer (EEI) using an undulator as a light source was installed in New SUBARU synchrotron facility at Himeji Institute of Technology (HIT). The EEI can evaluate the five metrology methods reported before. (1) A purpose of the EEI is to determine the most suitable method for measuring the projection optics of EUV lithography systems for mass production tools.

EUV tools: hydrogen gas purification and recovery strategies

NASA Astrophysics Data System (ADS)

Landoni, Cristian; Succi, Marco; Applegarth, Chuck; Riddle Vogt, Sarah

2015-03-01

The technological challenges that have been overcome to make extreme ultraviolet lithography (EUV) a reality have been enormous1. This vacuum driven technology poses significant purity challenges for the gases employed for purging and cleaning the scanner EUV chamber and source. Hydrogen, nitrogen, argon and ultra-high purity compressed dry air (UHPCDA) are the most common gases utilized at the scanner and source level. Purity requirements are tighter than for previous technology node tools. In addition, specifically for hydrogen, EUV tool users are facing not only gas purity challenges but also the need for safe disposal of the hydrogen at the tool outlet. Recovery, reuse or recycling strategies could mitigate the disposal process and reduce the overall tool cost of operation. This paper will review the types of purification technologies that are currently available to generate high purity hydrogen suitable for EUV applications. Advantages and disadvantages of each purification technology will be presented. Guidelines on how to select the most appropriate technology for each application and experimental conditions will be presented. A discussion of the most common approaches utilized at the facility level to operate EUV tools along with possible hydrogen recovery strategies will also be reported.

Well-defined EUV wave associated with a CME-driven shock

NASA Astrophysics Data System (ADS)

Cunha-Silva, R. D.; Selhorst, C. L.; Fernandes, F. C. R.; Oliveira e Silva, A. J.

2018-05-01

Aims: We report on a well-defined EUV wave observed by the Extreme Ultraviolet Imager (EUVI) on board the Solar Terrestrial Relations Observatory (STEREO) and the Atmospheric Imaging Assembly (AIA) on board the Solar Dynamics Observatory (SDO). The event was accompanied by a shock wave driven by a halo CME observed by the Large Angle and Spectrometric Coronagraph (LASCO-C2/C3) on board the Solar and Heliospheric Observatory (SOHO), as evidenced by the occurrence of type II bursts in the metric and dekameter-hectometric wavelength ranges. We investigated the kinematics of the EUV wave front and the radio source with the purpose of verifying the association between the EUV wave and the shock wave. Methods: The EUV wave fronts were determined from the SDO/AIA images by means of two appropriate directions (slices). The heights (radial propagation) of the EUV wave observed by STEREO/EUVI and of the radio source associated with the shock wave were compared considering the whole bandwidth of the harmonic lane of the radio emission, whereas the speed of the shock was estimated using the lowest frequencies of the harmonic lane associated with the undisturbed corona, using an appropriate multiple of the Newkirk (1961, ApJ, 133, 983) density model and taking into account the H/F frequency ratio fH/fF = 2. The speed of the radio source associated with the interplanetary shock was determined using the Mann et al. (1999, A&A, 348, 614) density model. Results: The EUV wave fronts determined from the SDO/AIA images revealed the coexistence of two types of EUV waves, a fast one with a speed of 560 km s-1, and a slower one with a speed of 250 km s-1, which corresponds approximately to one-third of the average speed of the radio source ( 680 km s-1). The radio signature of the interplanetary shock revealed an almost constant speed of 930 km s-1, consistent with the linear speed of the halo CME (950 km s-1) and with the values found for the accelerating coronal shock ( 535-823 km s-1), taking into account the gap between the radio emissions.

Laser plasma cryogenic target on translating substrate for generation of continuously repetitive EUV and soft X-ray pulses

DOE Office of Scientific and Technical Information (OSTI.GOV)

Amano, Sho

2014-06-15

To generate continuously repetitive EUV and soft X-ray pulses with various wavelengths from laser-produced plasmas, a one-dimensionally translating substrate system with a closed He gas cryostat that can continuously supply various cryogenic targets for ∼10 Hz laser pulses has been developed. The system was successfully operated at a lowest temperature of 15 K and at a maximum up-down speed of 12 mm/s. Solid Ar, Kr, and Xe layers were formed, and their growth rates and the laser crater sizes on them were studied. By optimization of the operational parameters in accordance with our design rule, it was shown that stablemore » output power was achieved continuously from the plasma emission at frequencies of 1–10 Hz. The average soft X-ray and EUV powers obtained were 19 mW at 3.2 nm, 33 mW at 10.0 nm, and 66 mW at 10.8 nm, with 10% bandwidths, from the Ar, Kr, and Xe solid targets, respectively, with a laser power of 1 W. We will be able to achieve higher frequencies using a high beam quality laser that produces smaller craters, and can expect higher powers. Although only Ar, Kr, and Xe gases were tested in this study, the target system achieved a temperature of 15 K and can thus solidify almost all target gases, apart from H and He, and can continuously supply the solid target. The use of various target materials will enable expansion of the EUV and soft X-ray emission wavelength range.« less

The Extreme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Malina, R. F.; Bowyer, S.; Lampton, M.; Finley, D.; Paresce, F.; Penegor, G.; Heetderks, H.

1982-01-01

The Extreme Ultraviolet Explorer Mission is described. The purpose of this mission is to search the celestial sphere for astronomical sources of extreme ultraviolet (EUV) radiation (100 to 1000 A). The search will be accomplished with the use of three EUV telescopes, each sensitive to different bands within the EUV band. A fourth telescope will perform a higher sensitivity search of a limited sample of the sky in a single EUV band. In six months, the entire sky will be scanned at a sensitivity level comparable to existing surveys in other more traditional astronomical bandpasses.

Generation of sub-optical-cycle, carrier-envelope-phase--insensitive, extreme-uv pulses via nonlinear stabilization in a waveguide

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sandhu, Arvinder S.; Gagnon, Etienne; Paul, Ariel

2006-12-15

We present evidence for a new regime of high-harmonic generation in a waveguide where bright, sub-optical-cycle, quasimonochromatic, extreme ultraviolet (EUV) light is generated via a mechanism that is relatively insensitive to carrier-envelope phase fluctuations. The interplay between the transient plasma which determines the phase matching conditions and the instantaneous laser intensity which drives harmonic generation gives rise to a new nonlinear stabilization mechanism in the waveguide, localizing the phase-matched EUV emission to within sub-optical-cycle duration. The sub-optical-cycle EUV emission generated by this mechanism can also be selectively optimized in the spectral domain by simple tuning of parameters.

Bulk Acceleration of Electrons in Solar Flares?

NASA Astrophysics Data System (ADS)

Holman, Gordon D.

2014-06-01

In two recent papers it has been argued that RHESSI observations of two coronal “above-the-loop-top” hard X-ray sources, together with EUV observations, show that ALL the electrons in the source volumes must have been accelerated. I will briefly review these papers and show that the interpretation most consistent with the combined flare observations is multi-thermal, with hot, thermal plasma in the “above-the-loop-top” sources and only a fraction, albeit a substantial fraction, of the electrons accelerated. Thus, there is no credible scientific evidence for bulk acceleration of electrons in flares. Differential emission measure (DEM) models deduced from SDO/AIA and RHESSI data, including the inversion of the AIA data to determine DEM, will be discussed as part of this analysis.

Study on the lifetime of Mo/Si multilayer optics with pulsed EUV-source at the ETS

NASA Astrophysics Data System (ADS)

Schürmann, Mark; Yulin, Sergiy; Nesterenko, Viatcheslav; Feigl, Torsten; Kaiser, Norbert; Tkachenko, Boris; Schürmann, Max C.

2011-06-01

As EUV lithography is on its way into production stage, studies of optics contamination and cleaning under realistic conditions become more and more important. Due to this fact an Exposure Test Stand (ETS) has been constructed at XTREME technologies GmbH in collaboration with Fraunhofer IOF and with financial support of Intel Corporation. This test stand is equipped with a pulsed DPP source and allows for the simultaneous exposure of several samples. In the standard set-up four samples with an exposed area larger than 35 mm2 per sample can be exposed at a homogeneous intensity of 0.25 mW/mm2. A recent update of the ETS allows for simultaneous exposures of two samples with intensities up to 1.0 mW/mm2. The first application of this alternative set-up was a comparative study of carbon contamination rates induced by EUV radiation from the pulsed source with contamination rates induced by quasicontinuous synchrotron radiation. A modified gas-inlet system allows for the introduction of a second gas to the exposure chamber. This possibility was applied to investigate the efficiency of EUV-induced cleaning with different gas mixtures. In particular the enhancement of EUV-induced cleaning by addition of a second gas to the cleaning gas was studied.

Analytical techniques for mechanistic characterization of EUV photoresists

NASA Astrophysics Data System (ADS)

Grzeskowiak, Steven; Narasimhan, Amrit; Murphy, Michael; Ackerman, Christian; Kaminsky, Jake; Brainard, Robert L.; Denbeaux, Greg

2017-03-01

Extreme ultraviolet (EUV, 13.5 nm) lithography is the prospective technology for high volume manufacturing by the microelectronics industry. Significant strides towards achieving adequate EUV source power and availability have been made recently, but a limited rate of improvement in photoresist performance still delays the implementation of EUV. Many fundamental questions remain to be answered about the exposure mechanisms of even the relatively well understood chemically amplified EUV photoresists. Moreover, several groups around the world are developing revolutionary metal-based resists whose EUV exposure mechanisms are even less understood. Here, we describe several evaluation techniques to help elucidate mechanistic details of EUV exposure mechanisms of chemically amplified and metal-based resists. EUV absorption coefficients are determined experimentally by measuring the transmission through a resist coated on a silicon nitride membrane. Photochemistry can be evaluated by monitoring small outgassing reaction products to provide insight into photoacid generator or metal-based resist reactivity. Spectroscopic techniques such as thin-film Fourier transform infrared (FTIR) spectroscopy can measure the chemical state of a photoresist system pre- and post-EUV exposure. Additionally, electrolysis can be used to study the interaction between photoresist components and low energy electrons. Collectively, these techniques improve our current understanding of photomechanisms for several EUV photoresist systems, which is needed to develop new, better performing materials needed for high volume manufacturing.

Initial results from the extreme ultraviolet explorer

NASA Technical Reports Server (NTRS)

Bowyer, S.; Malina, R. F.

1993-01-01

Data obtained during the first five months of calibration and science operation of the Extreme Ultraviolet Explorer (EUVE) are presented. Spectra of an extragalactic object were obtained; the object is detectable to wavelenghts longer than 100 A, demonstrating that extragalactic EUV astronomy is possible. Spectra of a hot white dwarf, and a late-type star in quiescence and flaring are shown as examples of the type of spectrographic data obtainable with EUVE. Other objects for which broad band photometric mode data have been obtained and analyzed include an RS CVn star and several late-type stars. The backgrounds in the EUVE detectors are quite low and the character of the diffuse astronomical EUV background has been investigated using these very low rates. Evidence is presented showing that, contrary to previously published reports, EUVE is about three times more sensitive than the English Wide Field Camera in the short wavelength bandpass covered by both instruments. Only limited information has been extracted from the longer bandpasses coered only by EUVE. Nonetheless, the brightest EUV source in the sky, a B star, has been discovered and is detected only in these longer bandpasses.

A new Schwarzschild optical system for two-dimensional EUV imaging of MRX plasmas

NASA Astrophysics Data System (ADS)

Bolgert, P.; Bitter, M.; Efthimion, P.; Hill, K. W.; Ji, H.; Myers, C. E.; Yamada, M.; Yoo, J.; Zweben, S.

2013-10-01

This poster describes the design and construction of a new Schwarzschild optical system for two-dimensional EUV imaging of plasmas. This optical system consists of two concentric spherical mirrors with radii R1 and R2, and is designed to operate with certain angles of incidence θ1 and θ2. The special feature of this system resides in the fact that all the rays passing through the system are tangential to a third concentric circle; it assures that the condition for Bragg reflection is simultaneously fulfilled at each point on the two reflecting surfaces if the spherical mirrors are replaced by spherical multi-layer structures. A prototype of this imaging system will be implemented in the Magnetic Reconnection Experiment (MRX) at PPPL to obtain two-dimensional EUV images of the plasma in the energy range from 18 to 62 eV; the relative intensity of the emitted radiation in this energy range was determined from survey measurements with a photodiode. It is thought that the radiation at these energies is due to Bremsstrahlung and line emission caused by suprathermal electrons. This research is supported by DoE Contract Number DE-AC02-09CH11466 and by the Center for Magnetic Self-Organization (CMSO).

A Search for EUV Emission from the O4f Star Zeta Puppis

NASA Technical Reports Server (NTRS)

Waldron, Wayne L.; Vallerga, John

1996-01-01

We obtained a 140 ks EUVE observation of the O4f star, zeta Puppis. Because of its low ISM column density and highly ionized stellar wind, a unique EUV window is accessible for viewing between 128 to 140 A, suggesting that this star may he the only O star observable with the EUVE. Although no SW spectrometer wavelength bin had a signal to noise greater than 3, a bin at 136 A had a signal to noise of 2.4. This bin is where models predict the brightest line due to OV emission should occur. We present several EUV line emission models. These models were constrained by fitting the ROSAT PSPC X-ray data and our EUVE data. If the OV emission is real, the best fits to the data suggest that there are discrepancies in our current understanding of EUV/X-ray production mechanisms. In particular, the emission measure of the EUV source is found to be much greater than the total wind emission measure, suggesting that the EUV shock must produce a very large density enhancement. In addition, the location of the EUV and X-ray shocks are found to be separated by approx. 0.3 stellar radii, but the EUV emission region is found to be approx. 400 times larger than the X-ray emission region. We also discuss the implications of a null detection and present relevant upper limits.

Modeling 13.3nm Fe XXIII Flare Emissions Using the GOES-R EXIS Instrument

NASA Astrophysics Data System (ADS)

Rook, H.; Thiemann, E.

2017-12-01

The solar EUV spectrum is dominated by atomic transitions in ionized atoms in the solar atmosphere. As solar flares evolve, plasma temperatures and densities change, influencing abundances of various ions, changing intensities of different EUV wavelengths observed from the sun. Quantifying solar flare spectral irradiance is important for constraining models of Earth's atmosphere, improving communications quality, and controlling satellite navigation. However, high time cadence measurements of flare irradiance across the entire EUV spectrum were not available prior to the launch of SDO. The EVE MEGS-A instrument aboard SDO collected 0.1nm EUV spectrum data from 2010 until 2014, when the instrument failed. No current or future instrument is capable of similar high resolution and time cadence EUV observation. This necessitates a full EUV spectrum model to study EUV phenomena at Earth. It has been recently demonstrated that one hot flare EUV line, such as the 13.3nm Fe XXIII line, can be used to model cooler flare EUV line emissions, filling the role of MEGS-A. Since unblended measurements of Fe XXIII are typically unavailable, a proxy for the Fe XXIII line must be found. In this study, we construct two models of this line, first using the GOES 0.1-0.8nm soft x-ray (SXR) channel as the Fe XXIII proxy, and second using a physics-based model dependent on GOES emission measure and temperature data. We determine that the more sophisticated physics-based model shows better agreement with Fe XXIII measurements, although the simple proxy model also performs well. We also conclude that the high correlation between Fe XXIII emissions and the GOES 0.1-0.8nm band is because both emissions tend to peak near the GOES emission measure peak despite large differences in their contribution functions.

Relationship between hard X-ray and EUV sources in solar flares

NASA Technical Reports Server (NTRS)

Kane, S. R.; Frost, K. J.; Donnelly, R. F.

1979-01-01

The high time resolution hard X-ray (not less than 15 keV) observations of medium and large impulsive solar flares made with the OSO 5 satellite are compared with the simultaneous ground-based observations of 10-1030 A EUV flux made via sudden frequency deviations (SFD) at Boulder. For most flares the agreement between the times of maxima of the impulsive hard X-ray and EUV emissions is found to be consistent with earlier studies (not less than 1 s). The rise and decay times of the EUV emission are larger than the corresponding times for X-rays not less than 30 keV. When OSO 5 hard X-ray measurements are combined with those made by OGO1, OGO 3, OGO 5, and TD 1A satellites, it is found that there is a nearly linear relationship between the energy fluxes of impulsive EUV emission and X-rays not less than 10 keV over a wide range of flare magnitudes. A model involving only a 'partial precipitation' of energetic electrons and consisting of both thick and thin target hard X-ray sources is examined.

Spectral tailoring of nanoscale EUV and soft x-ray multilayer optics

NASA Astrophysics Data System (ADS)

Huang, Qiushi; Medvedev, Viacheslav; van de Kruijs, Robbert; Yakshin, Andrey; Louis, Eric; Bijkerk, Fred

2017-03-01

Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling the spectral characteristics of light for advanced applications like EUV photolithography, space observation, and accelerator- or lab-based XUV experiments. Both planar and three dimensional multilayer structures have been developed to tailor the spectral response in a wide wavelength range. For the planar multilayer optics, different layered schemes are explored. Stacks of periodic multilayers and capping layers are demonstrated to achieve multi-channel reflection or suppression of the reflective properties. Aperiodic multilayer structures enable broadband reflection both in angles and wavelengths, with the possibility of polarization control. The broad wavelength band multilayer is also used to shape attosecond pulses for the study of ultrafast phenomena. Narrowband multilayer monochromators are delivered to bridge the resolution gap between crystals and regular multilayers. High spectral purity multilayers with innovated anti-reflection structures are shown to select spectrally clean XUV radiation from broadband X-ray sources, especially the plasma sources for EUV lithography. Significant progress is also made in the three dimensional multilayer optics, i.e., combining micro- and nanostructures with multilayers, in order to provide new freedom to tune the spectral response. Several kinds of multilayer gratings, including multilayer coated gratings, sliced multilayer gratings, and lamellar multilayer gratings are being pursued for high resolution and high efficiency XUV spectrometers/monochromators, with their advantages and disadvantages, respectively. Multilayer diffraction optics are also developed for spectral purity enhancement. New structures like gratings, zone plates, and pyramids that obtain full suppression of the unwanted radiation and high XUV reflectance are reviewed. Based on the present achievement of the spectral tailoring multilayer optics, the remaining challenges and opportunities for future researches are discussed.

The Formation of Coronal Loops by Thermal Instability in Three Dimensions

NASA Technical Reports Server (NTRS)

Mok, Yung; Mikic, Zoran; Lionello, Roberto; Linker, Jon A.

2008-01-01

Plasma loops in solar active regions have been observed in EUV and soft X-rays for decades. Their formation mechanism and properties, however, are still not fully understood. Predictions by early models, based on 1D hydrostatic equilibria with uniform plasma heating, are not consistent with high-resolution measurements. In this Letter, we demonstrate, via 3D simulations, that a class of heating models can lead to the dynamic formation of plasma loops provided the plasma is heated sufficiently to match SXT soft X-ray measurements. We show that individual flux tubes in a 3D magnetic structure tend to stand out against their neighbors. The loops have large aspect ratios and nearly uniform cross sections in the corona, similar to those observed by EIT and TRACE. The coronal EUV emission from these thermally unstable solutions is roughly consistent with EIT measurements. The solution oscillates in time through a large-amplitude, nonlinear cycle, leading to repeated brightening and fading of the loops.

Using Sdo's AIA to Investigate Energy Transport from a Flare's Energy Release Site to the Chromosphere

NASA Technical Reports Server (NTRS)

Brosius, Jeffrey W.; Holman, Gordon D.

2012-01-01

Coordinated observations of a GOES B4.8 microflare with SDOs Atmospheric Imaging Assembly (AIA) and the RamatyHigh Energy Solar Spectroscopic Imager (RHESSI) on 2010 July 31 show that emission in all seven of AIAs EUV channels brightened simultaneously nearly 6 min before RHESSI or GOES detected emission from plasma at temperatures around 10 MK. Aims. To help interpret these and AIA flare observations in general, we characterized the expected temporal responses of AIAs 94, 131, 171, 193, 211, and 335 channels to solar flare brightenings by combining (1) AIAs nominal temperature response functions available through SSWIDL with (2) EUV spectral line data observed in a flare loop Coordinated observations of a GOES B4.8 microflare with SDOs Atmospheric Imaging Assembly (AIA) and the RamatyHigh Energy Solar Spectroscopic Imager (RHESSI) on 2010 July 31 show that emission in all seven of AIAs EUV channels brightenedsimultaneously nearly 6 min before RHESSI or GOES detected emission from plasma at temperatures around 10 MK.Aims. To help interpret these and AIA flare observations in general, we characterized the expected temporal responses of AIAs 94,131, 171, 193, 211, and 335 channels to solar flare brightenings by combining (1) AIAs nominal temperature response functionsavailable through SSWIDL with (2) EUV spectral line data observed in a flare loop

Line analysis of EUV Spectra from Molybdenum and Tungsten Injected with Impurity Pellets in LHD

NASA Astrophysics Data System (ADS)

Chowdhuri, Malay Bikas; Morita, Shigeru; Goto, Motoshi; Nishimura, Hiroaki; Nagai, Keiji; Fujioka, Shinsuke

Spectroscopic data on high-Z materials for impurity diagnostics are important due to its possible use as a plasma facing component in the next generation fusion device. For this purpose molybdenum and tungsten are injected by an impurity pellet injector into the large helical device (LHD) plasmas. Emissions from such highly ionized elements mostly fall in extreme ultraviolet (EUV) and soft X-ray ranges. The EUV spectra in a range of 20-500 Å are recorded using a flat-field EUV spectrometer. The observed emissions are identified with the help of its temporal evolution and detailed analysis is done with electron temperature profiles. At high central electron temperature (˜2.2 keV) molybdenum appears as an Al-, Mg- and Na-like ionization stages. Typical examples of identified transitions are Mo XXXI 190.46 Å (3 s2 1S-3s3p 3P) and Mo XXXII 176.63 Å (3s 2S-3p 2P). For tungsten, on the other hand, three well-separated bands appear in wavelength range of 24-80 Å. The transitions around 33 Å have been tentatively identified with the help of calculated values. Most of the isolated lines on the top of pseudo-continuum bands around 50 and 60 Å are identified, and the wavelengths are compared with previous experimental studies and also with calculated values.

Lifetime estimation of extreme-ultraviolet pellicle at 500 W source power by thermal stress analysis

NASA Astrophysics Data System (ADS)

Park, Eun-Sang; Ban, Chung-Hyun; Park, Jae-Hun; Oh, Hye-Keun

2017-10-01

The analysis of the thermal stress and the extreme-ultraviolet (EUV) pellicle is important since the pellicle could be easily damaged since the thickness of the pellicle is 50 nm thin due to 90% required EUV transmission. One of the solution is using a high emissivity metallic material on the both sides of the pellicle and it can lower the thermal stress. However, using a metallic coating on pellicle core which is usually consist of silicon group can decrease the EUV transmission compared to using a single core layer pellicle only. Therefore, we optimized thermal and optical properties of the pellicle and elect three types of the pellicle. In this paper we simulated our optimized pellicles with 500W source power. The result shows that the difference of the thermal stress is small for each case. Therefore, our result also shows that using a high emissivity coating is necessary since the cooling of the pellicle strongly depends on emissivity and it can lower the stress effectively even at high EUV source power.

Anti­-parallel Filament Flows and Bright Dots Observed in the EUV with Hi-­C

NASA Technical Reports Server (NTRS)

Alexander, Caroline E.; Regnier, Stephane; Walsh, Robert; Winebarger, Amy

2013-01-01

Hi-C obtained the highest spatial and temporal resolution observations ever taken in the solar EUV corona. Hi-C reveals dynamics and structure at the limit of its temporal and spatial resolution. Hi-C observed various fine-scale features that SDO/AIA could not pick out. For the first time in the corona, Hi-C revealed magnetic braiding and component reconnection consistent with coronal heating. Hi-C shows evidence of reconnection and heating in several different regions and magnetic configurations with plasma being heated to 0.3 - 8 x 10(exp 6) K temperatures. Surprisingly, many of the first results highlight plasma at temperatures that are not at the peak of the response functions.

The quiescent and flaring EUV spectrum of Algol and its relationship to other active coronae. EUV spectroscopy of bright hyades coronae: 71 Tauri and Theta 1 Tauri

NASA Technical Reports Server (NTRS)

Stern, Robert A.

1994-01-01

This program involves analysis and interpretation of EUVE spectrometer observations of the active stars Algol (beta Per) and 71 Tauri. The EUVE satellite spectrometers observed the prototype eclipsing binary Algol over nearly 1.5 orbital periods. Effective exposure times were 100 ksec and 89 ksec in the short wave (70-180 A) and medium wave (140-370 A) channels. High temperature (up to 20 MK) Fe XVI-XXIV emission lines are clearly detected in the overall spectrum. In addition, a quiescent continuum is present which increases towards shorter wavelengths. Using synthesized spectra of optically thin line and continuum emission folded through the instrumental response, we have examined constraints on the (Fe/H) coronal abundance in Algol. We find that the coronal Fe is underabundant by factors that approximately equal 2-4 relative to solar photospheric values, unless an unreasonably large quantity of coronal plasma at T greater than 30 MK is present in the quiescent spectrum. The latter possibility is, however, inconsistent with available X-ray data. Lightcurves of the high temperature EUV lines compared to line emission at He II 304 A show considerable differences, with much deeper minima present in the He II line during both primary and secondary eclipses. Toward the end of the observation a moderate flare lasting approximately 6 hours was detected in the high temperature Fe emission lines. The 71 Tau observation, for about the same exposure time, revealed only a handful of weak emission lines; however, the strongest lines were also those of Fe XXIII/XX, suggesting a hot coronal plasma. No obvious flaring or other variation was present in the 71 Tau Deep Survey lightcurve.

A new mask exposure and analysis facility

NASA Astrophysics Data System (ADS)

te Sligte, Edwin; Koster, Norbert; Deutz, Alex; Staring, Wilbert

2014-10-01

The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at high EUV powers and intensities, and capable of exposing and analyzing EUV masks. The proposed system architecture is similar to the EBL system which has been operated jointly by TNO and Carl Zeiss SMT since 2005. EBL2 contains an EUV Beam Line, in which samples can be exposed to EUV irradiation in a controlled environment. Attached to this Beam Line is an XPS system, which can be reached from the Beam Line via an in-vacuum transfer system. This enables surface analysis of exposed masks without breaking vacuum. Automated handling with dual pods is foreseen so that exposed EUV masks will still be usable in EUV lithography tools to assess the imaging impact of the exposure. Compared to the existing system, large improvements in EUV power, intensity, reliability, and flexibility are proposed. Also, in-situ measurements by e.g. ellipsometry is foreseen for real time monitoring of the sample condition. The system shall be equipped with additional ports for EUVR or other analysis tools. This unique facility will be open for external customers and other research groups.

Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiation

DOE Office of Scientific and Technical Information (OSTI.GOV)

Klebanoff, Leonard E.; Delgado, Gildardo R.; Hollenshead, Jeromy T.

An optical instrument, including a chamber, an object exposed to an interior of the chamber, a source of low-pressure gas, the gas comprising at least one of low-pressure molecular hydrogen gas, low-pressure molecular oxygen and a low-pressure noble gas, the source of low pressure gas being fluidly coupled to the chamber, a low voltage source electrically coupled between the object and a remaining portion of the instrument that is exposed to the interior of the chamber so as to maintain the object at a low voltage relative to the remaining portion, and an EUV/VUV light source adapted to direct EUV/VUVmore » light through the low pressure gas in the chamber onto the object. In such a system, when the EUV/VUV light source is activated ions of the low-pressure gas are formed and directed to the object. The ions may be ions of Hydrogen, Oxygen or a noble gas.« less

Status of EUVL mask development in Europe (Invited Paper)

NASA Astrophysics Data System (ADS)

Peters, Jan H.

2005-06-01

EUV lithography is the prime candidate for the next generation lithography technology after 193 nm immersion lithography. The commercial onset for this technology is expected for the 45 nm half-pitch technology or below. Several European and national projects and quite a large number of companies and research institutions in Europe work on various aspects of the technological challenges to make EUV a commercially viable technology in the not so far future. Here the development of EUV sources, the development of an EUV exposure tools, metrology tools dedicated for characterization of mask, the production of EUV mask blanks and the mask structuring itself are the key areas in which major activities can be found. In this talk we will primarily focus on those activities, which are related to establish an EUV mask supply chain with all its ingredients from substrate production, polishing, deposition of EUV layers, blank characterization, mask patterning process and the consecutive metrology and defect inspection as well as shipping and handling from blank supply to usage in the wafer fab. The EUV mask related projects on the national level are primarily supported by the French Ministry of Economics and Finance (MinEFi) and the German Ministry of Education and Research (BMBF).

Extreme ultraviolet and soft x-ray diagnostics of high-temperature plasmas. Annual progress report

DOE Office of Scientific and Technical Information (OSTI.GOV)

Moos, H W; Armstrong, L Jr

1980-01-01

The work performed from mid-January 1979 through 1980 is described. EUV diagnostic studies have been performed at the Alcator A and C Tokamaks, and on TMX. A toroidal asymmetry has been found in the low density phase of Alcator A. The confinement time of impurities has been measured on Alcator A. Impurity concentrations in the center cell of TMX have been studied using EUV spectroscopic techniques. A time resolving spectrograph with 1024 detector elements is essentially complete.

RS CVn binaries: Testing the solar-stellar dynamo connection

NASA Technical Reports Server (NTRS)

Dempsey, R.

1995-01-01

We have used the Extreme Ultraviolet Explorer satellite to study the coronal emission from the EUV-bright RS CVn binaries Sigma2 CrB, observed February 10-21, 1994, and II Peg, observed October 1-5, 1993. We present time-resolved and integrated EUV short-, medium-, and long-wavelength spectra for these binaries. Sigma2 CrB shows significant first-order emission features in the long-wavelength region. The coronal emission distributions and electron densities are estimated for those active coronae dominated by high temperature plasma.

Dry etching technologies for reflective multilayer

NASA Astrophysics Data System (ADS)

Iino, Yoshinori; Karyu, Makoto; Ita, Hirotsugu; Kase, Yoshihisa; Yoshimori, Tomoaki; Muto, Makoto; Nonaka, Mikio; Iwami, Munenori

2012-11-01

We have developed a highly integrated methodology for patterning Extreme Ultraviolet (EUV) mask, which has been highlighted for the lithography technique at the 14nm half-pitch generation and beyond. The EUV mask is characterized as a reflective-type mask which is completely different compared with conventional transparent-type of photo mask. And it requires not only patterning of absorber layer without damaging the underlying multi reflective layers (40 Si/Mo layers) but also etching multi reflective layers. In this case, the dry etch process has generally faced technical challenges such as the difficulties in CD control, etch damage to quartz substrate and low selectivity to the mask resist. Shibaura Mechatronics ARESTM mask etch system and its optimized etch process has already achieved the maximal etch performance at patterning two-layered absorber. And in this study, our process technologies of multi reflective layers will be evaluated by means of optimal combination of process gases and our optimized plasma produced by certain source power and bias power. When our ARES™ is used for multilayer etching, the user can choose to etch the absorber layer at the same time or etch only the multilayer.

The extreme ultraviolet spectra of low-redshift radio-loud quasars

NASA Astrophysics Data System (ADS)

Punsly, Brian; Reynolds, Cormac; Marziani, Paola; O'Dea, Christopher P.

2016-07-01

This paper reports on the extreme ultraviolet (EUV) spectrum of three low-redshift (z ˜ 0.6) radio-loud quasars, 3C 95, 3C 57 and PKS 0405-123. The spectra were obtained with the Cosmic Origins Spectrograph of the Hubble Space Telescope. The bolometric thermal emission, Lbol, associated with the accretion flow is a large fraction of the Eddington limit for all of these sources. We estimate the long-term time-averaged jet power, overline{Q}, for the three sources. overline{Q}/L_{bol}, is shown to lie along the correlation of overline{Q}/L_{bol}, and αEUV found in previous studies of the EUV continuum of intermediate and high-redshift quasars, where the EUV continuum flux density between 1100 and 700 Å is defined by F_{ν } ˜ ν ^{-α _{EUV}}. The high Eddington ratios of the three quasars extend the analysis into a wider parameter space. Selecting quasars with high Eddington ratios has accentuated the statistical significance of the partial correlation analysis of the data. Namely, the correlation of overline{Q}/L_{bol} and αEUV is fundamental, and the correlation of overline{Q} and αEUV is spurious at a very high statistical significance level (99.8 per cent). This supports the regulating role of ram pressure of the accretion flow in magnetically arrested accretion models of jet production. In the process of this study, we use multifrequency and multiresolution Very Large Array radio observations to determine that one of the bipolar jets in 3C 57 is likely frustrated by galactic gas that keeps the jet from propagating outside the host galaxy.

MHD Modelling of Coronal Loops: Injection of High-Speed Chromospheric Flows

NASA Technical Reports Server (NTRS)

Petralia, A.; Reale, F.; Orlando, S.; Klimchuk, J. A.

2014-01-01

Context. Observations reveal a correspondence between chromospheric type II spicules and bright upward-moving fronts in the corona observed in the extreme-ultraviolet (EUV) band. However, theoretical considerations suggest that these flows are probably not the main source of heating in coronal magnetic loops. Aims. We investigate the propagation of high-speed chromospheric flows into coronal magnetic flux tubes and the possible production of emission in the EUV band. Methods. We simulated the propagation of a dense 104 K chromospheric jet upward along a coronal loop by means of a 2D cylindrical MHD model that includes gravity, radiative losses, thermal conduction, and magnetic induction. The jet propagates in a complete atmosphere including the chromosphere and a tenuous cool (approximately 0.8 MK) corona, linked through a steep transition region. In our reference model, the jet initial speed is 70 km per second, its initial density is 10(exp 11) per cubic centimeter, and the ambient uniform magnetic field is 10 G. We also explored other values of jet speed and density in 1D and different magnetic field values in 2D, as well as the jet propagation in a hotter (approximately 1.5 MK) background loop. Results. While the initial speed of the jet does not allow it to reach the loop apex, a hot shock-front develops ahead of it and travels to the other extreme of the loop. The shock front compresses the coronal plasma and heats it to about 10(exp 6) K. As a result, a bright moving front becomes visible in the 171 Angstrom channel of the SDO/AIA mission. This result generally applies to all the other explored cases, except for the propagation in the hotter loop. Conclusions. For a cool, low-density initial coronal loop, the post-shock plasma ahead of upward chromospheric flows might explain at least part of the observed correspondence between type II spicules and EUV emission excess.

EUVE and IR observations of the Polars HU Aqr and AR UMa

NASA Astrophysics Data System (ADS)

Howell, S.; Ciardi, D.

1999-12-01

Simultaneous EUVE and ground-based near-infrared J and K observations of the magnetic CV HU Aqr were performed. The observations occurred during a super-high state never before observed in HU Aqr. The average EUVE count-rate was 30-60 times higher than had been measured previously, allowing us to present the first ever EUV spectra of HU Aqr. The near-infrared observations show a corresponding flux increase of 2-3 times over previous J and K observations. However, the near-infrared eclipse minimum during this super-high state are the same as seen in previous observations, indicating that the eclipse in the near-infrared is total. We present a detailed comparison of the EUV and near-infrared emission of HU Aqr as a function of orbital phase and discuss the geometry and physical properties of the high energy and infrared emitting regions. AR UMa is the brightest EUV source yet observed with the EUVE satellite and is also the polar with the largest magnetic field, 250 MG. EUVE observations of the polar AR UMa have allowed, for the first time, EUV time-resolved spectral analysis and radial velocity measurements. We present EUV phase-resolved photometry and spectroscopy and show that the He 304 emission line is not produced on the heated face of the secondary star, but emanates from the inner illuminated regions of the coupling region and accretion stream. We comment on the overall structure of the accretion geometry as well. The authors acknowledge partial support of the research by NASA cooperative agreement NCC5-138 via an EUVE guest Observer mini-grant.

Study on photochemical analysis system (VLES) for EUV lithography

NASA Astrophysics Data System (ADS)

Sekiguchi, A.; Kono, Y.; Kadoi, M.; Minami, Y.; Kozawa, T.; Tagawa, S.; Gustafson, D.; Blackborow, P.

2007-03-01

A system for photo-chemical analysis of EUV lithography processes has been developed. This system has consists of 3 units: (1) an exposure that uses the Z-Pinch (Energetiq Tech.) EUV Light source (DPP) to carry out a flood exposure, (2) a measurement system RDA (Litho Tech Japan) for the development rate of photo-resists, and (3) a simulation unit that utilizes PROLITH (KLA-Tencor) to calculate the resist profiles and process latitude using the measured development rate data. With this system, preliminary evaluation of the performance of EUV lithography can be performed without any lithography tool (Stepper and Scanner system) that is capable of imaging and alignment. Profiles for 32 nm line and space pattern are simulated for the EUV resist (Posi-2 resist by TOK) by using VLES that hat has sensitivity at the 13.5nm wavelength. The simulation successfully predicts the resist behavior. Thus it is confirmed that the system enables efficient evaluation of the performance of EUV lithography processes.

Spectroscopy and Photometry of EUVE J1429-38.0:An Eclipsing Magnetic Cataclysmic Variable

NASA Astrophysics Data System (ADS)

Howell, Steve B.; Craig, Nahide; Roberts, Bryce; McGee, Paddy; Sirk, Martin

1997-06-01

EUVE J1429-38.0 was originally discovered as a variable source by the Extreme Ultraviolet Explorer (EUVE) satellite. We present new optical observations which unambiguously confirm this star to be an eclipsing magnetic system with an orbital period of 4() h 46() m. The photometric data are strongly modulated by ellipsoidal variations during low states which allow a system inclination of near 80 degrees to be determined. Our time-resolved optical spectra, which cover only about one-third of the orbital cycle, indicate the clear presence of a gas stream. During high states, EUVE J1429-38.0 shows ~ 1 mag deep eclipses and the apparent formation of a partial accretion disk. EUVE J1429-38.0 presents the observer with properties of both the AM Herculis and the DQ Herculis types of magnetic cataclysmic variable.

Fundamentals of EUV resist-inorganic hardmask interactions

NASA Astrophysics Data System (ADS)

Goldfarb, Dario L.; Glodde, Martin; De Silva, Anuja; Sheshadri, Indira; Felix, Nelson M.; Lionti, Krystelle; Magbitang, Teddie

2017-03-01

High resolution Extreme Ultraviolet (EUV) patterning is currently limited by EUV resist thickness and pattern collapse, thus impacting the faithful image transfer into the underlying stack. Such limitation requires the investigation of improved hardmasks (HMs) as etch transfer layers for EUV patterning. Ultrathin (<5nm) inorganic HMs can provide higher etch selectivity, lower post-etch LWR, decreased defectivity and wet strippability compared to spin-on hybrid HMs (e.g., SiARC), however such novel layers can induce resist adhesion failure and resist residue. Therefore, a fundamental understanding of EUV resist-inorganic HM interactions is needed in order to optimize the EUV resist interfacial behavior. In this paper, novel materials and processing techniques are introduced to characterize and improve the EUV resist-inorganic HM interface. HM surface interactions with specific EUV resist components are evaluated for open-source experimental resist formulations dissected into its individual additives using EUV contrast curves as an effective characterization method to determine post-development residue formation. Separately, an alternative adhesion promoter platform specifically tailored for a selected ultrathin inorganic HM based on amorphous silicon (aSi) is presented and the mitigation of resist delamination is exemplified for the cases of positive-tone and negative-tone development (PTD, NTD). Additionally, original wafer priming hardware for the deposition of such novel adhesion promoters is unveiled. The lessons learned in this work can be directly applied to the engineering of EUV resist materials and processes specifically designed to work on such novel HMs.

EUVE observations of Algol: Detection of a continuum and implications for the coronal (Fe/H) abundance

NASA Technical Reports Server (NTRS)

Stern, Robert A.; Lemen, James R.; Schmitt, Jurgen H. M. M.; Pye, John P.

1995-01-01

We report results from the first extreme ultraviolet spectrum of the prototypical eclipsing binary Algol (beta Per), obtained with the spectrometers on the Extreme Ultraviolet Explorer (EUVE). The Algol spectrum in the 80-350 A range is dominated by emission lines of Fe XVI-XXIV, and the He II 304 A line. The Fe emission is characteristic of high-temperature plasma at temperatures up to at least log T approximately 7.3 K. We have successfully modeled the observed quiescent spectrum using a continuous emission measure distribution with the bulk of the emitting material at log T greater than 6.5. We are able to adequately fit both the coronal lines and continuum data with a cosmic abundance plasma, but only if Algol's quiescent corona is dominated by material at log T greater than 7.5, which is physically ruled out by prior X-ray observations of the quiescent Algol spectrum. Since the coronal (Fe/H) abundance is the principal determinant of the line-to-continuum ratio in the EUV, allowing the abundance to be a free parameter results in models with a range of best-fit abundances approximately = 15%-40% of solar photospheric (Fe/H). Since Algol's photospheric (Fe/H) appears to be near-solar, the anomalous EUV line-to-continuum ratio could either be the result of element segregation in the coronal formation process, or other, less likely mechanisms that may enhance the continuum with respect to the lines.

Plasma cleaning of nanoparticles from EUV mask materials by electrostatics

NASA Astrophysics Data System (ADS)

Lytle, W. M.; Raju, R.; Shin, H.; Das, C.; Neumann, M. J.; Ruzic, D. N.

2008-03-01

Particle contamination on surfaces used in extreme ultraviolet (EUV) mask blank deposition, mask fabrication, and patterned mask handling must be avoided since the contamination can create significant distortions and loss of reflectivity. Particles on the order of 10nm are problematic during MLM mirror fabrication, since the introduced defects disrupt the local Bragg planes. The most serious problem is the accumulation of particles on surfaces of patterned blanks during EUV light exposure, since > 25nm particles will be printed without an out-of-focus pellicle. Particle contaminants are also a problem with direct imprint processes since defects are printed every time. Plasma Assisted Cleaning by Electrostatics (PACE) works by utilizing a helicon plasma as well as a pulsed DC substrate bias to charge particle and repel them electrostatically from the surface. Removal of this nature is a dry cleaning method and removes contamination perpendicular from the surface instead of rolling or sweeping the particles off the surface, a benefit when cleaning patterned surfaces where contamination can be rolled or trapped between features. Also, an entire mask can be cleaned at once since the plasma can cover the entire surface, thus there is no need to focus in on an area to clean. Sophisticated particle contamination detection system utilizing high power laser called DEFCON is developed to analyze the particle removal after PACE cleaning process. PACE has shown greater than 90 % particle removal efficiencies for 30 to 220 nm PSL particles on ruthenium capped quartz. Removal results for silicon surfaces and quartz surfaces show similar removal efficiencies. Results of cleaning 80 nm PSL spheres from silicon substrates will be shown.

Monitoring of solar far ultraviolet radiation from the OSO-5 satellite

NASA Technical Reports Server (NTRS)

Rense, W. A.; Parker, R.

1972-01-01

A spectrophotometer for monitoring the solar EUV in three broad wavelength bands is described. The kind of data obtained, along with sources of error, are presented. The content of the tape library which contains the data is outlined. The scientific results are discussed. These include the following: solar flares in the EUV, solar eclipse observations in the EUV, SFD's and relationship to solar flares, and the application of satellite sunrise and sunset data for the study of model upper atmospheres for the earth.

Properties of the Io plasma torus inferred from Voyager EUV data

NASA Technical Reports Server (NTRS)

Strobel, D. F.; Davis, J.

1980-01-01

A physical model for the Io plasma torus is constructed to explain the EUV radiative emission observed by the Voyager UV spectrometer. Electron impact excitation rate coefficients for electronic transitions of S III, S IV, O II and O III are calculated by the method of distorted waves (Davis, Kepple, and Blaha, 1976); these coefficients account for the asymmetric shape of the 686 A feature. It is concluded that the electron gas must have a distribution function with a non-Maxwellian tail. An approximate representation of the distribution function as two temperature components requires a cold component of 3.5-4 eV and density of 2000 per cu cm and a hot component of about 100 eV and density of 50-100 per cu cm to satisfy observational constraints.

Atomic hydrogen cleaning of EUV multilayer optics

NASA Astrophysics Data System (ADS)

Graham, Samuel, Jr.; Steinhaus, Charles A.; Clift, W. Miles; Klebanoff, Leonard E.; Bajt, Sasa

2003-06-01

Recent studies have been conducted to investigate the use of atomic hydrogen as an in-situ contamination removal method for EUV optics. In these experiments, a commercial source was used to produce atomic hydrogen by thermal dissociation of molecular hydrogen using a hot filament. Samples for these experiments consisted of silicon wafers coated with sputtered carbon, Mo/Si optics with EUV-induced carbon, and bare Si-capped and Ru-B4C-capped Mo/Si optics. Samples were exposed to an atomic hydrogen source at a distance of 200 - 500 mm downstream and angles between 0-90° with respect to the source. Carbon removal rates and optic oxidation rates were measured using Auger electron spectroscopy depth profiling. In addition, at-wavelength peak reflectance (13.4 nm) was measured using the EUV reflectometer at the Advanced Light Source. Data from these experiments show carbon removal rates up to 20 Ê/hr for sputtered carbon and 40 Ê/hr for EUV deposited carbon at a distance of 200 mm downstream. The cleaning rate was also observed to be a strong function of distance and angular position. Experiments have also shown that the carbon etch rate can be increased by a factor of 4 by channeling atomic hydrogen through quartz tubes in order to direct the atomic hydrogen to the optic surface. Atomic hydrogen exposures of bare optic samples show a small risk in reflectivity degradation after extended periods. Extended exposures (up to 20 hours) of bare Si-capped Mo/Si optics show a 1.2% loss (absolute) in reflectivity while the Ru-B4C-capped Mo/Si optics show a loss on the order of 0.5%. In order to investigate the source of this reflectivity degradation, optic samples were exposed to atomic deuterium and analyzed using low energy ion scattering direct recoil spectroscopy to determine any reactions of the hydrogen with the multilayer stack. Overall, the results show that the risk of over-etching with atomic hydrogen is much less than previous studies using RF discharge cleaning while providing cleaning rates suitable for EUV lithography operations.

Atomic hydrogen cleaning of EUV multilayer optics

NASA Astrophysics Data System (ADS)

Graham, Samuel, Jr.; Steinhaus, Charles A.; Clift, W. Miles; Klebanoff, Leonard E.; Bajt, Sasa

2003-06-01

Recent studies have been conducted to investigate the use of atomic hydrogen as an in-situ contamination removal method for EUV optics. In these experiments, a commercial source was used to produce atomic hydrogen by thermal dissociation of molecular hydrogen using a hot filament. Samples for these experiments consisted of silicon wafers coated with sputtered carbon, Mo/Si optics with EUV-induced carbon, and bare Si-capped and Ru-B4C-capped Mo/Si optics. Samples were exposed to an atomic hydrogen source at a distance of 200 - 500 mm downstream and angles between 0-90° with respect to the source. Carbon removal rates and optic oxidation rates were measured using Auger electron spectroscopy depth profiling. In addition, at-wavelength peak reflectance (13.4 nm) was measured using the EUV reflectometer at the Advanced Light Source. Data from these experiments show carbon removal rates up to 20 Å/hr for sputtered carbon and 40 Å/hr for EUV deposited carbon at a distance of 200 mm downstream. The cleaning rate was also observed to be a strong function of distance and angular position. Experiments have also shown that the carbon etch rate can be increased by a factor of 4 by channeling atomic hydrogen through quartz tubes in order to direct the atomic hydrogen to the optic surface. Atomic hydrogen exposures of bare optic samples show a small risk in reflectivity degradation after extended periods. Extended exposures (up to 20 hours) of bare Si-capped Mo/Si optics show a 1.2% loss (absolute) in reflectivity while the Ru-B4C-capped Mo/Si optics show a loss on the order of 0.5%. In order to investigate the source of this reflectivity degradation, optic samples were exposed to atomic deuterium and analyzed using low energy ion scattering direct recoil spectroscopy to determine any reactions of the hydrogen with the multilayer stack. Overall, the results show that the risk of over-etching with atomic hydrogen is much less than previous studies using RF discharge cleaning while providing cleaning rates suitable for EUV lithography operations.

Quantitative Evaluation of Hard X-ray Damage to Biological Samples using EUV Ptychography

NASA Astrophysics Data System (ADS)

Baksh, Peter; Odstrcil, Michal; Parsons, Aaron; Bailey, Jo; Deinhardt, Katrin; Chad, John E.; Brocklesby, William S.; Frey, Jeremy G.

2017-06-01

Coherent diffractive imaging (CDI) has become a standard method on a variety of synchrotron beam lines. The high brilliance short wavelength radiation from these sources can be used to reconstruct attenuation and relative phase of a sample with nanometre resolution via CDI methods. However, the interaction between the sample and high energy ionising radiation can cause degradation to sample structure. We demonstrate, using a laboratory based high harmonic generation (HHG) based extreme ultraviolet (EUV) source, imaging a sample of hippocampal neurons using the ptychography method. The significant increase in contrast of the sample in the EUV light allows identification of damage induced from exposure to 7.3 keV photons, without causing any damage to the sample itself.

OBSERVATIONS OF THERMAL FLARE PLASMA WITH THE EUV VARIABILITY EXPERIMENT

DOE Office of Scientific and Technical Information (OSTI.GOV)

Warren, Harry P.; Doschek, George A.; Mariska, John T.

2013-06-20

One of the defining characteristics of a solar flare is the impulsive formation of very high temperature plasma. The properties of the thermal emission are not well understood, however, and the analysis of solar flare observations is often predicated on the assumption that the flare plasma is isothermal. The EUV Variability Experiment (EVE) on the Solar Dynamics Observatory provides spectrally resolved observations of emission lines that span a wide range of temperatures (e.g., Fe XV-Fe XXIV) and allow for thermal flare plasma to be studied in detail. In this paper we describe a method for computing the differential emission measuremore » distribution in a flare using EVE observations and apply it to several representative events. We find that in all phases of the flare the differential emission measure distribution is broad. Comparisons of EVE spectra with calculations based on parameters derived from the Geostationary Operational Environmental Satellites soft X-ray fluxes indicate that the isothermal approximation is generally a poor representation of the thermal structure of a flare.« less

Sharpening of the 6.8 nm peak in an Nd:YAG laser produced Gd plasma by using a pre-formed plasma

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tian, Yong; Song, Xiaolin; Xie, Zhuo

For effective use of a laser-produced-plasma (LPP) light source, an LPP is desired to emit a narrow spectral peak because the reflection spectrum of multilayer mirrors for guiding emission from the source is very narrow. While a Gd plasma has been studied extensively as an extreme ultraviolet (EUV) light source at around 6.8 nm, where La/B{sub 4}C multilayer is reported to have a high reflectivity with a bandwidth of about 0.6 %, all previous works using an Nd:YAG laser reported very broad spectra. This paper reports the first narrowing of the 6.8 nm peak in the case of using anmore » Nd:YAG laser to generate a Gd plasma by using a pre-pulse. The best peak narrowing is observed when a pre-formed plasma is heated by a 1064 nm main laser pulse with a duration of 10 ns at the irradiation density of 4x 10{sup 11} W/cm{sup 2} at a delay time of 50 ns after the pre-pulse irradiation. The observed spectral width of about 0.3 nm is about one fifth of the value for no pre-formed plasma. The peak wavelength of the 6.8 nm band shifted to a longer wavelength side and the peak was broadened both for lower and higher laser irradiation density. It is discussed that this robustness of the peak position of the 6.8 nm Gd peak against temperature change is suitable to achieve a narrow bandwidth from an LPP generated on solid. The observed spectra are compared with those previously reported in various conditions.« less

Determination of temperature maps of EUV coronal hole jets

NASA Astrophysics Data System (ADS)

Nisticò, Giuseppe; Patsourakos, Spiros; Bothmer, Volker; Zimbardo, Gaetano

2011-11-01

Coronal hole jets are fast ejections of plasma occurring within coronal holes, observed at Extreme-UltraViolet (EUV) and X-ray wavelengths. Recent observations of jets by the STEREO and Hinode missions show that they are transient phenomena which occur at much higher rates than large-scale impulsive phenomena like flares and Coronal Mass Ejections (CMEs). In this paper we describe some typical characteristics of coronal jets observed by the SECCHI instruments of STEREO spacecraft. We show an example of 3D reconstruction of the helical structure for a south pole jet, and present how the angular distribution of the jet position angles changes from the Extreme-UltraViolet-Imager (EUVI) field of view to the CORonagraph1 (COR1) (height ∼2.0 R⊙ heliocentric distance) field of view. Then we discuss a preliminary temperature determination for the jet plasma by using the filter ratio method at 171 and 195 Å and applying a technique for subtracting the EUV background radiation. The results show that jets are characterized by electron temperatures ranging between 0.8 and 1.3 MK. We present the thermal structure of the jet as temperature maps and we describe its thermal evolution.

Toward compact and ultra-intense laser-based soft x-ray lasers

NASA Astrophysics Data System (ADS)

Sebban, S.; Depresseux, A.; Oliva, E.; Gautier, J.; Tissandier, F.; Nejdl, J.; Kozlova, M.; Maynard, G.; Goddet, J. P.; Tafzi, A.; Lifschitz, A.; Kim, H. T.; Jacquemot, S.; Rousseau, P.; Zeitoun, P.; Rousse, A.

2018-01-01

We report here recent work on an optical field ionized (OFI), high-order harmonic-seeded EUV laser. The amplifying medium is a plasma of nickel-like krypton obtained by OFI when focusing a 1 J, 30 fs, circularly-polarized, infrared pulse into a krypton-filled gas cell or krypton gas jet. The lasing transition is the 3d94d (J = 0) → 3d94p (J = 1) transition of Ni-like krypton ions at 32.8 nm and is pumped by collisions with hot electrons. The gain dynamics was probed by seeding the amplifier with a high-order harmonic pulse at different delays. The gain duration monotonically decreased from 7 ps to an unprecedented shortness of 450 fs full width at half-maximum as the amplification peak rose from 150 to 1200 with an increase of the plasma density from 3 × 1018 to 1.2 × 1020 cm-3. The integrated energy of the EUV laser pulse was also measured, and found to be around 2 μJ. It is to be noted that in the ASE mode, longer amplifiers were achieved (up to 2 cm), yielding EUV outputs up to 14 μJ.

CME Expansion as the Driver of Metric Type II Shock Emission as Revealed by Self-consistent Analysis of High-Cadence EUV Images and Radio Spectrograms

NASA Astrophysics Data System (ADS)

Kouloumvakos, A.; Patsourakos, S.; Hillaris, A.; Vourlidas, A.; Preka-Papadema, P.; Moussas, X.; Caroubalos, C.; Tsitsipis, P.; Kontogeorgos, A.

2014-06-01

On 13 June 2010, an eruptive event occurred near the solar limb. It included a small filament eruption and the onset of a relatively narrow coronal mass ejection (CME) surrounded by an extreme ultraviolet (EUV) wave front recorded by the Solar Dynamics Observatory's (SDO) Atmospheric Imaging Assembly (AIA) at high cadence. The ejection was accompanied by a GOES M1.0 soft X-ray flare and a Type-II radio burst; high-resolution dynamic spectra of the latter were obtained by the Appareil de Routine pour le Traitement et l'Enregistrement Magnetique de l'Information Spectral (ARTEMIS IV) radio spectrograph. The combined observations enabled a study of the evolution of the ejecta and the EUV wave front and its relationship with the coronal shock manifesting itself as metric Type-II burst. By introducing a novel technique, which deduces a proxy of the EUV compression ratio from AIA imaging data and compares it with the compression ratio deduced from the band-split of the Type-II metric radio burst, we are able to infer the potential source locations of the radio emission of the shock on that AIA images. Our results indicate that the expansion of the CME ejecta is the source for both EUV and radio shock emissions. Early in the CME expansion phase, the Type-II burst seems to originate in the sheath region between the EUV bubble and the EUV shock front in both radial and lateral directions. This suggests that both the nose and the flanks of the expanding bubble could have driven the shock.

EUV lithography: NXE platform performance overview

NASA Astrophysics Data System (ADS)

Peeters, Rudy; Lok, Sjoerd; Mallman, Joerg; van Noordenburg, Martijn; Harned, Noreen; Kuerz, Peter; Lowisch, Martin; van Setten, Eelco; Schiffelers, Guido; Pirati, Alberto; Stoeldraijer, Judon; Brandt, David; Farrar, Nigel; Fomenkov, Igor; Boom, Herman; Meiling, Hans; Kool, Ron

2014-04-01

The first NXE3300B systems have been qualified and shipped to customers. The NXE:3300B is ASML's third generation EUV system and has an NA of 0.33. It succeeds the NXE:3100 system (NA of 0.25), which has allowed customers to gain valuable EUV experience. Good overlay and imaging performance has been shown on the NXE:3300B system in line with 22nm device requirements. Full wafer CDU performance of <1.5nm for 22nm dense and iso lines at a dose of ~16mJ/cm2 has been achieved. Matched machine overlay (NXE to immersion) of around 3.5nm has been demonstrated on multiple systems. Dense lines have been exposed down to 13nm half pitch, and contact holes down to 17nm half pitch. 10nm node Metal-1 layers have been exposed with a DOF of 120nm, and using single spacer assisted double patterning flow a resolution of 9nm has been achieved. Source power is the major challenge to overcome in order to achieve cost-effectiveness in EUV and enable introduction into High Volume Manufacturing. With the development of the MOPA+prepulse operation of the source, steps in power have been made, and with automated control the sources have been prepared to be used in a preproduction fab environment. Flexible pupil formation is under development for the NXE:3300B which will extend the usage of the system in HVM, and the resolution for the full system performance can be extended to 16nm. Further improvements in defectivity performance have been made, while in parallel full-scale pellicles are being developed. In this paper we will discuss the current NXE:3300B performance, its future enhancements and the recent progress in EUV source performance.

The Nature of the Flaring EUVE Companion to HD 43162

NASA Technical Reports Server (NTRS)

Kulkarni, Shrinivas R.

2005-01-01

The purpose of our program was to observe and characterize the companion to HD 43162, EUVE J0614-2354, which (serendipitously) experienced an enormous flare event during our EUVE observation of HD 43162, one of the nearby solar analogs that we observed during our survey of this population. Our observation was carried out and the data have been received and reduced. We are able to identify EUVE J0614-2354 in both the X-ray (EPIC MOS + PN) and the UV (OM) data, which provides a sub-arcsecond position for this source. Our findings are consistent with the analysis of Christian et al. (2003a,b), who identify EUVE J0614-2354 with a coronally-active M-dwarf star at distance d = 15 plus or minus 5pc. The X-ray spectrum from the EPIC data are also consistent with this identification.

Prototype through-pellicle coherent imaging using a 30nm tabletop EUV source

NASA Astrophysics Data System (ADS)

Bevis, Charles S.; Karl, Robert M.; Wang, Bin; Esashi, Yuka; Tanksalvala, Michael; Porter, Christina L.; Johnsen, Peter; Adams, Daniel E.; Murnane, Margaret M.; Kapteyn, Henry C.

2018-03-01

We present preliminary through-pellicle imaging using a 30nm tabletop extreme ultraviolet (EUV) coherent diffractive imaging microscope. We show that even in a non-optimized setup, this technique enables through-pellicle imaging of a sample with no detectable impact on image fidelity or resolution.

Density Structures, Dynamics, and Seasonal and Solar Cycle Modulations of Saturn's Inner Plasma Disk

NASA Astrophysics Data System (ADS)

Holmberg, M. K. G.; Shebanits, O.; Wahlund, J.-E.; Morooka, M. W.; Vigren, E.; André, N.; Garnier, P.; Persoon, A. M.; Génot, V.; Gilbert, L. K.

2017-12-01

We present statistical results from the Cassini Radio and Plasma Wave Science (RPWS) Langmuir probe measurements recorded during the time interval from orbit 3 (1 February 2005) to 237 (29 June 2016). A new and improved data analysis method to obtain ion density from the Cassini LP measurements is used to study the asymmetries and modulations found in the inner plasma disk of Saturn, between 2.5 and 12 Saturn radii (1 RS=60,268 km). The structure of Saturn's plasma disk is mapped, and the plasma density peak, nmax, is shown to be located at ˜4.6 RS and not at the main neutral source region at 3.95 RS. The shift in the location of nmax is due to that the hot electron impact ionization rate peaks at ˜4.6 RS. Cassini RPWS plasma disk measurements show a solar cycle modulation. However, estimates of the change in ion density due to varying EUV flux is not large enough to describe the detected dependency, which implies that an additional mechanism, still unknown, is also affecting the plasma density in the studied region. We also present a dayside/nightside ion density asymmetry, with nightside densities up to a factor of 2 larger than on the dayside. The largest density difference is found in the radial region 4 to 5 RS. The dynamic variation in ion density increases toward Saturn, indicating an internal origin of the large density variability in the plasma disk rather than being caused by an external source origin in the outer magnetosphere.

Mars Thermospheric Temperature Sensitivity to Solar EUV Forcing from the MAVEN EUV Monitor

NASA Astrophysics Data System (ADS)

Thiemann, Ed; Eparvier, Francis; Andersson, Laila; Pilinski, Marcin; Chamberlin, Phillip; Fowler, Christopher; MAVEN Extreme Ultraviolet Monitor Team, MAVEN Langmuir Probe and Waves Team

2017-10-01

Solar extreme ultraviolet (EUV) radiation is the primary heat source for the Mars thermosphere, and the primary source of long-term temperature variability. The Mars obliquity, dust cycle, tides and waves also drive thermospheric temperature variability; and it is important to quantify the role of each in order to understand processes in the upper atmosphere today and, ultimately, the evolution of Mars climate over time. Although EUV radiation is the dominant heating mechanism, accurately measuring the thermospheric temperature sensitivity to EUV forcing has remained elusive, in part, because Mars thermospheric temperature varies dramatically with latitude and local time (LT), ranging from 150K on the nightside to 300K on the dayside. It follows that studies of thermospheric variability must control for location.Instruments onboard the Mars Atmosphere and Volatile EvolutioN (MAVEN) orbiter have begun to characterize thermospheric temperature sensitivity to EUV forcing. Bougher et al. [2017] used measurements from the Imaging Ultraviolet Spectrograph (IUVS) and the Neutral Gas and Ion Mass Spectrometer (NGIMS) to characterize solar activity trends in the thermosphere with some success. However, aside from restricting measurements to solar zenith angles (SZAs) below 75 degrees, they were unable to control for latitude and LT because repeat-track observations from either instrument were limited or unavailable.The MAVEN EUV Monitor (EUVM) has recently demonstrated the capability to measure thermospheric density from 100 to 200 km with solar occultations of its 17-22 nm channel. These new density measurements are ideal for tracking the long-term thermospheric temperature variability because they are inherently constrained to either 06:00 or 18:00 LT, and the orbit has precessed to include a range of ecliptic latitudes, a number of which have been revisited multiple times over 2.5 years. In this study we present, for the first-time, measurements of thermospheric temperature sensitivity to EUV forcing derived from the EUVM measurements. These results include sensitives measured at the poles and near the equator for both terminators; therefore, we will also discuss the role of latitude on EUV temperature sensitivity.

Diagnosis of energy transport in iron buried layer targets using an extreme ultraviolet laser

DOE Office of Scientific and Technical Information (OSTI.GOV)

Shahzad, M.; Culfa, O.; Rossall, A. K.

2015-02-15

We demonstrate the use of extreme ultra-violet (EUV) laboratory lasers in probing energy transport in laser irradiated solid targets. EUV transmission through targets containing a thin layer of iron (50 nm) encased in plastic (CH) after irradiation by a short pulse (35 fs) laser focussed to irradiances 3 × 10{sup 16} Wcm{sup −2} is measured. Heating of the iron layer gives rise to a rapid decrease in EUV opacity and an increase in the transmission of the 13.9 nm laser radiation as the iron ionizes to Fe{sup 5+} and above where the ion ionisation energy is greater than the EUV probe photon energy (89 eV).more » A one dimensional hydrodynamic fluid code HYADES has been used to simulate the temporal variation in EUV transmission (wavelength 13.9 nm) using IMP opacity values for the iron layer and the simulated transmissions are compared to measured transmission values. When a deliberate pre-pulse is used to preform an expanding plastic plasma, it is found that radiation is important in the heating of the iron layer while for pre-pulse free irradiation, radiation transport is not significant.« less

A study of EUV emission from the O4f star Zeta Puppis

NASA Technical Reports Server (NTRS)

Waldron, Wayne L.; Vallerga, John

1995-01-01

Our 20 ks observation did not allow us to carry out our primary objective, i.e., to test the limitations of deeply embedded EUV and X-ray sources. However, it did provide a very useful constraint in our analysis of a newly acquired high S/N ROSAT PSPC X-ray spectrum of Zeta Pup. In addition, modifications to our stellar wind opacity code have been preformed to investigate the sensitivity of the EUV opacity energy range to different photospheric model flux inputs and different wind structures. These analyses provided the justification for a 140 ks follow up EUVE Cycle III observation of this star. We have recently been informed that our requested observation has been accepted as a Type 1 target for Cycle III. The remainder of this report focuses on the following: (1) a brief background on the status of X-ray emission from OB stars; (2) a discussion on the importance of EUV observations; (3) a discussion of our scientific objectives; and (4) a summary of our technical approach for our Cycle III observation (including the predicted EUV counts for various lines.)

Performance of one hundred watt HVM LPP-EUV source

NASA Astrophysics Data System (ADS)

Mizoguchi, Hakaru; Nakarai, Hiroaki; Abe, Tamotsu; Nowak, Krzysztof M.; Kawasuji, Yasufumi; Tanaka, Hiroshi; Watanabe, Yukio; Hori, Tsukasa; Kodama, Takeshi; Shiraishi, Yutaka; Yanagida, Tatsuya; Soumagne, Georg; Yamada, Tsuyoshi; Yamazaki, Taku; Okazaki, Shinji; Saitou, Takashi

2015-03-01

We have been developing CO2-Sn-LPP EUV light source which is the most promising solution as the 13.5nm high power light source for HVM EUVL. Unique and original technologies such as: combination of pulsed CO2 laser and Sn droplets, dual wavelength laser pulses shooting, and mitigation with magnetic field, have been developed in Gigaphoton Inc. The theoretical and experimental data have clearly showed the advantage of our proposed strategy. Based on these data we are developing first practical source for HVM - "GL200E". This data means 250W EUV power will be able to realize around 20kW level pulsed CO2 laser. We have reported engineering data from our recent test such around 43W average clean power, CE=2.0%, with 100kHz operation and other data 19). We have already finished preparation of higher average power CO2 laser more than 20kW at output power cooperate with Mitsubishi Electric Corporation 14). Recently we achieved 92W with 50kHz, 50% duty cycle operation 20). We have reported component technology progress of EUV light source system. We report promising experimental data and result of simulation of magnetic mitigation system in Proto #1 system. We demonstrated several data with Proto #2 system: (1) emission data of 140W in burst under 70kHz 50% duty cycle during 10 minutes. (2) emission data of 118W in burst under 60kHz 70% duty cycle during 10 minutes. (3) emission data of 42W in burst under 20kHz 50% duty cycle (10000pls/0.5ms OFF) during 3 hours (110Mpls). Also we report construction of Pilot #1 system. Final target is week level operation with 250W EUV power with CE=4%, more than 27kW CO2 laser power by the end of Q2 of 2015.

Contrast matching of line gratings obtained with NXE3XXX and EUV- interference lithography

NASA Astrophysics Data System (ADS)

Tasdemir, Zuhal; Mochi, Iacopo; Olvera, Karen Garrido; Meeuwissen, Marieke; Yildirim, Oktay; Custers, Rolf; Hoefnagels, Rik; Rispens, Gijsbert; Fallica, Roberto; Vockenhuber, Michaela; Ekinci, Yasin

2017-10-01

Extreme UV lithography (EUVL) has gained considerable attention for several decades as a potential technology for the semiconductor industry and it is now close to being adopted in high-volume manufacturing. At Paul Scherrer Institute (PSI), we have focused our attention on EUV resist performance issues by testing available high-performance EUV resists in the framework of a joint collaboration with ASML. For this purpose, we use the grating-based EUV-IL setup installed at the Swiss Light Source (SLS) at PSI, in which a coherent beam with 13.5 nm wavelength is used to produce a periodic aerial image with virtually 100% contrast and large depth of focus. Interference lithography is a relatively simple technique and it does not require many optical components, therefore the unintended flare is minimized and the aerial image is well-defined sinusoidal pattern. For the collaborative work between PSI and ASML, exposures are being performed on the EUV-IL exposure tool at PSI. For better quantitative comparison to the NXE scanner results, it is targeted to determine the actual NILS of the EUV-IL exposure tool at PSI. Ultimately, any resist-related metrology must be aligned and compared with the performance of EUV scanners. Moreover, EUV-IL is a powerful method for evaluating the resist performance and a resist which performs well with EUV-IL, shows, in general, also good performance with NXE scanners. However, a quantitative prediction of the performance based on EUV-IL measurements has not been possible due to the differences in aerial image formation. In this work, we aim to study the performance of EUV resists with different aerial images. For this purpose, after the real interference pattern exposure, we overlay a flat field exposure to emulate different levels of contrast. Finally, the results are compared with data obtained from EUV scanner. This study will enable not only match the data obtained from EUV- IL at PSI with the performance of NXE scanners, but also a better understanding of resist fundamentals by studying the effects of the aerial image on resist performance by changing the aerial image contrast in a controlled manner using EUV-IL.

Extreme ultraviolet lithography machine

DOEpatents

Tichenor, Daniel A.; Kubiak, Glenn D.; Haney, Steven J.; Sweeney, Donald W.

2000-01-01

An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

Brightness and magnetic evolution of solar coronal bright points

NASA Astrophysics Data System (ADS)

Ugarte Urra, Ignacio

This thesis presents a study of the brightness and magnetic evolution of several Extreme ultraviolet (EUV) coronal bright points (hereafter BPs). The study was carried out using several instruments on board the Solar and Heliospheric Observatory, supported by the high resolution imaging from the Transition Region And Coronal Explorer. The results confirm that, down to 1" resolution, BPs are made of small loops with lengths of [approximate]6 Mm and cross-sections of ≈2 Mm. The loops are very dynamic, evolving in time scales as short as 1 - 2 minutes. This is reflected in a highly variable EUV response with fluctuations highly correlated in spectral lines at transition region temperatures, but not always at coronal temperatures. A wavelet analysis of the intensity variations reveals the existence of quasi-periodic oscillations with periods ranging 400--1000s, in the range of periods characteristic of the chromospheric network. The link between BPs and network bright points is discussed, as well as the interpretation of the oscillations in terms of global acoustic modes of closed magnetic structures. A comparison of the magnetic flux evolution of the magnetic polarities to the EUV flux changes is also presented. Throughout their lifetime, the intrinsic EUV emission of BPs is found to be dependent on the total magnetic flux of the polarities. In short time scales, co-spatial and co-temporal coronal images and magnetograms, reveal the signature of heating events that produce sudden EUV brightenings simultaneous to magnetic flux cancellations. This is interpreted in terms of magnetic reconnection events. Finally, a electron density study of six coronal bright points produces values of ≈1.6×10 9 cm -3 , closer to active region plasma than to quiet Sun. The analysis of a large coronal loop (half length of 72 Mm) introduces the discussion on the prospects of future plasma diagnostics of BPs with forthcoming solar missions.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yang, Bo; Jiang, Yunchun; Yang, Jiayan

Taking advantage of the high spatiotemporal resolution observations from the Atmospheric Imaging Assembly (AIA) and the Helioseismic and Magnetic Imager on board the Solar Dynamics Observatory, we present rare observations of the rapid formation of a filament caused by magnetic reconnection between two sets of dark threadlike structures. The two sets of dark threadlike structures belong to distinct flux systems with their adjacent ends anchored in an opposite-polarity magnetic field region, where the calculated photospheric velocity field shows that converging flows dominate there. Due to the converging flows, opposite-polarity magnetic flux converged and then canceled, leading to the formation ofmore » extreme ultraviolet (EUV) brightening that spread in opposite directions along the spine of the dark threadlike structures. Meanwhile, very weak remote brightening in the other terminals of the dark threadlike structures, as well as EUV loops, which rooted in the opposite-polarity magnetic field region, appeared. In addition, all of the AIA Fe line observations reveal that a flux rope was formed and underwent a rolling motion during the fadeaway of the EUV brightening. Soon after, as the EUV brightening disappeared, a filament that is very likely composed of two sets of intertwined dark threadlike structures was formed. Via differential emission measure (EM) analysis, it is found that both the EM and temperature of the plasma around the flux-canceling site increased during the brightening, implying that there, magnetic reconnection may occur to heat the plasma. These observations provide evidence that the filament is formed by magnetic reconnection associated with flux convergence and cancellation, and the magnetic structure of the filament is most likely a flux rope.« less

From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer Institute

NASA Astrophysics Data System (ADS)

Buitrago, Elizabeth; Fallica, Roberto; Fan, Daniel; Karim, Waiz; Vockenhuber, Michaela; van Bokhoven, Jeroen A.; Ekinci, Yasin

2016-09-01

Extreme ultraviolet interference lithography (EUV-IL, λ = 13.5 nm) has been shown to be a powerful technique not only for academic, but also for industrial research and development of EUV materials due to its relative simplicity yet record high-resolution patterning capabilities. With EUV-IL, it is possible to pattern high-resolution periodic images to create highly ordered nanostructures that are difficult or time consuming to pattern by electron beam lithography (EBL) yet interesting for a wide range of applications such as catalysis, electronic and photonic devices, and fundamental materials analysis, among others. Here, we will show state-of the-art research performed using the EUV-IL tool at the Swiss Light Source (SLS) synchrotron facility in the Paul Scherrer Institute (PSI). For example, using a grating period doubling method, a diffraction mask capable of patterning a world record in photolithography of 6 nm half-pitch (HP), was produced. In addition to the description of the method, we will give a few examples of applications of the technique. Well-ordered arrays of suspended silicon nanowires down to 6.5 nm linewidths have been fabricated and are to be studied as field effect transistors (FETs) or biosensors, for instance. EUV achromatic Talbot lithography (ATL), another interference scheme that utilizes a single grating, was shown to yield well-defined nanoparticles over large-areas with high uniformity presenting great opportunities in the field of nanocatalysis. EUV-IL is in addition, playing a key role in the future introduction of EUV lithography into high volume manufacturing (HVM) of semiconductor devices for the 7 and 5 nm logic node (16 nm and 13 nm HP, respectively) and beyond while the availability of commercial EUV-tools is still very much limited for research.

Electrical comparison of iN7 EUV hybrid and EUV single patterning BEOL metal layers

NASA Astrophysics Data System (ADS)

Larivière, Stéphane; Wilson, Christopher J.; Kutrzeba Kotowska, Bogumila; Versluijs, Janko; Decoster, Stefan; Mao, Ming; van der Veen, Marleen H.; Jourdan, Nicolas; El-Mekki, Zaid; Heylen, Nancy; Kesters, Els; Verdonck, Patrick; Béral, Christophe; Van den Heuvel, Dieter; De Bisschop, Peter; Bekaert, Joost; Blanco, Victor; Ciofi, Ivan; Wan, Danny; Briggs, Basoene; Mallik, Arindam; Hendrickx, Eric; Kim, Ryoung-han; McIntyre, Greg; Ronse, Kurt; Bömmels, Jürgen; Tőkei, Zsolt; Mocuta, Dan

2018-03-01

The semiconductor scaling roadmap shows the continuous node to node scaling to push Moore's law down to the next generations. In that context, the foundry N5 node requires 32nm metal pitch interconnects for the advanced logic Back- End of Line (BEoL). 193immersion usage now requires self-aligned and/or multiple patterning technique combinations to enable such critical dimension. On the other hand, EUV insertion investigation shows that 32nm metal pitch is still a challenge but, related to process flow complexity, presents some clear motivations. Imec has already evaluated on test chip vehicles with different patterning approaches: 193i SAQP (Self-Aligned Quadruple Patterning), LE3 (triple patterning Litho Etch), tone inversion, EUV SE (Single Exposure) with SMO (Source-mask optimization). Following the run path in the technology development for EUV insertion, imec N7 platform (iN7, corresponding node to the foundry N5) is developed for those BEoL layers. In this paper, following technical motivation and development learning, a comparison between the iArF SAQP/EUV block hybrid integration scheme and a single patterning EUV flow is proposed. These two integration patterning options will be finally compared from current morphological and electrical criteria.

The initial data products from the EUVE software - A photon's journey through the End-to-End System

NASA Technical Reports Server (NTRS)

Antia, Behram

1993-01-01

The End-to-End System (EES) is a unique collection of software modules created for use at the Center for EUV Astrophysics. The 'pipeline' is a shell script which executes selected EES modules and creates initial data products: skymaps, data sets for individual sources (called 'pigeonholes') and catalogs of sources. This article emphasizes the data from the all-sky survey, conducted between July 22, 1992 and January 21, 1993. A description of each of the major data products will be given and, as an example of how the pipeline works, the reader will follow a photon's path through the software pipeline into a pigeonhole. These data products are the primary goal of the EUVE all-sky survey mission, and so their relative importance for the follow-up science will also be discussed.

A study of tungsten spectra using large helical device and compact electron beam ion trap in NIFS

NASA Astrophysics Data System (ADS)

Morita, S.; Dong, C. F.; Goto, M.; Kato, D.; Murakami, I.; Sakaue, H. A.; Hasuo, M.; Koike, F.; Nakamura, N.; Oishi, T.; Sasaki, A.; Wang, E. H.

2013-07-01

Tungsten spectra have been observed from Large Helical Device (LHD) and Compact electron Beam Ion Trap (CoBIT) in wavelength ranges of visible to EUV. The EUV spectra with unresolved transition array (UTA), e.g., 6g-4f, 5g-4f, 5f-4d and 5p-4d transitions for W+24-+33, measured from LHD plasmas are compared with those measured from CoBIT with monoenergetic electron beam (≤2keV). The tungsten spectra from LHD are well analyzed based on the knowledge from CoBIT tungsten spectra. The C-R model code has been developed to explain the UTA spectra in details. Radial profiles of EUV spectra from highly ionized tungsten ions have been measured and analyzed by impurity transport simulation code with ADPAK atomic database code to examine the ionization balance determined by ionization and recombination rate coefficients. As the first trial, analysis of the tungsten density in LHD plasmas is attempted from radial profile of Zn-like WXLV (W44+) 4p-4s transition at 60.9Å based on the emission rate coefficient calculated with HULLAC code. As a result, a total tungsten ion density of 3.5×1010cm-3 at the plasma center is reasonably obtained. In order to observe the spectra from tungsten ions in lower-ionized charge stages, which can give useful information on the tungsten influx in fusion plasmas, the ablation cloud of the impurity pellet is directly measured with visible spectroscopy. A lot of spectra from neutral and singly ionized tungsten are observed and some of them are identified. A magnetic forbidden line from highly ionized tungsten ions has been examined and Cd-like WXXVII (W26+) at 3893.7Å is identified as the ground-term fine-structure transition of 4f23H5-3H4. The possibility of α particle diagnostic in D-T burning plasmas using the magnetic forbidden line is discussed.

Radiative cooling efficiencies and predicted spectra of species of the Io plasma torus

NASA Technical Reports Server (NTRS)

Shemansky, D. E.

1980-01-01

Calculations of the physical condition of the Io plasma torus have been made based on the recent Voyager EUV observations. The calculations represent an assumed thin plasma collisional ionization equilibrium among the states within each species. The observations of the torus are all consistent with this condition. The major energy loss mechanism is radiative cooling in discrete transitions. Calculations of radiative cooling efficiencies of the identified species leads to an estimated energy loss rate of at least 1.5 x 10 to the 12th watts. The mean electron temperature and density of the plasma are estimated to be 100,000 K and 2100/cu cm. The estimated number densities of S III, S IV, and O III are roughly 95, 80, and 190-740/cu cm. Upper limits have been placed on a number of other species based on the first published Voyager EUV spectrum of the torus. The assumption that energy is supplied to the torus through injection of neutral particles from Io leads to the conclusion that ion loss rates are controlled by diffusion, and relative species abundances consequently are not controlled by collisional ionization equilibrium.

Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

DOE Office of Scientific and Technical Information (OSTI.GOV)

Roy, Amitava, E-mail: roy@fzu.cz, E-mail: aroy@barc.gov.in; HiLASE Project, Department of Diode-pumped Lasers, Institute of Physics of the ASCR, Na Slovance 2, 18221 Prague; Murtaza Hassan, Syed

2014-05-15

We investigated the role of a guiding magnetic field on extreme ultraviolet (EUV) and ion emission from a laser produced Sn plasma for various laser pulse duration and intensity. For producing plasmas, planar slabs of pure Sn were irradiated with 1064 nm, Nd:YAG laser pulses with varying pulse duration (5–15 ns) and intensity. A magnetic trap was fabricated with the use of two neodymium permanent magnets which provided a magnetic field strength ∼0.5 T along the plume expansion direction. Our results indicate that the EUV conversion efficiency do not depend significantly on applied axial magnetic field. Faraday Cup ion analysis of Sn plasmamore » show that the ion flux reduces by a factor of ∼5 with the application of an axial magnetic field. It was found that the plasma plume expand in the lateral direction with peak velocity measured to be ∼1.2 cm/μs and reduced to ∼0.75 cm/μs with the application of an axial magnetic field. The plume expansion features recorded using fast photography in the presence and absence of 0.5 T axial magnetic field are simulated using particle-in-cell code. Our simulation results qualitatively predict the plasma behavior.« less

Multi-Wavelength Imaging of Solar Plasma - High-Beta Disruption Model of Solar Flares -

NASA Astrophysics Data System (ADS)

Shibasaki, Kiyoto

Solar atmosphere is filled with plasma and magnetic field. Activities in the atmosphere are due to plasma instabilities in the magnetic field. To understand the physical mechanisms of activities / instabilities, it is necessary to know the physical conditions of magnetized plasma, such as temperature, density, magnetic field, and their spatial structures and temporal developments. Multi-wavelength imaging is essential for this purpose. Imaging observations of the Sun at microwave, X-ray, EUV and optical ranges are routinely going on. Due to free exchange of original data among solar physics and related field communities, we can easily combine images covering wide range of spectrum. Even under such circumstances, we still do not understand the cause of activities in the solar atmosphere well. The current standard model of solar activities is based on magnetic reconnection: release of stored magnetic energy by reconnection is the cause of solar activities on the Sun such as solar flares. However, recent X-ray, EUV and microwave observations with high spatial and temporal resolution show that dense plasma is involved in activities from the beginning. Based on these observations, I propose a high-beta model of solar activities, which is very similar to high-beta disruptions in magnetically confined fusion experiments.

Development of quantitative atomic modeling for tungsten transport study using LHD plasma with tungsten pellet injection

NASA Astrophysics Data System (ADS)

Murakami, I.; Sakaue, H. A.; Suzuki, C.; Kato, D.; Goto, M.; Tamura, N.; Sudo, S.; Morita, S.

2015-09-01

Quantitative tungsten study with reliable atomic modeling is important for successful achievement of ITER and fusion reactors. We have developed tungsten atomic modeling for understanding the tungsten behavior in fusion plasmas. The modeling is applied to the analysis of tungsten spectra observed from plasmas of the large helical device (LHD) with tungsten pellet injection. We found that extreme ultraviolet (EUV) emission of W24+ to W33+ ions at 1.5-3.5 nm are sensitive to electron temperature and useful to examine the tungsten behavior in edge plasmas. We can reproduce measured EUV spectra at 1.5-3.5 nm by calculated spectra with the tungsten atomic model and obtain charge state distributions of tungsten ions in LHD plasmas at different temperatures around 1 keV. Our model is applied to calculate the unresolved transition array (UTA) seen at 4.5-7 nm tungsten spectra. We analyze the effect of configuration interaction on population kinetics related to the UTA structure in detail and find the importance of two-electron-one-photon transitions between 4p54dn+1- 4p64dn-14f. Radiation power rate of tungsten due to line emissions is also estimated with the model and is consistent with other models within factor 2.

Stellar and laboratory XUV/EUV line ratios in Fe XVIII and Fe XIX

DOE Office of Scientific and Technical Information (OSTI.GOV)

Traebert, E.; Beiersdorfer, P.; Clementson, J.

2012-05-25

A so-called XUV excess has been suspected with the relative fluxes of Fe XVIII and Fe XIX lines observed in the XUV and EUV ranges of the spectrum of the star Capella as observed by the Chandra spacecraft, even after correction for interstellar absorption. This excess becomes apparent in the comparison of the observations with simulations of stellar spectra obtained using collisional-radiative models that employ, for example, the Atomic Plasma Emission Code (APEC) or the Flexible Atomic Code (FAC). We have addressed this problem by laboratory studies using the Livermore electron beam ion trap (EBIT).

High-sensitivity green resist material with organic solvent-free spin-coating and tetramethylammonium hydroxide-free water-developable processes for EB and EUV lithography

NASA Astrophysics Data System (ADS)

Takei, Satoshi; Hanabata, Makoto; Oshima, Akihiro; Kashiwakura, Miki; Kozawa, Takahiro; Tagawa, Seiichi

2015-03-01

We investigated the eco-friendly electron beam (EB) and extreme-ultraviolet (EUV) lithography using a high-sensitive negative type of green resist material derived from biomass to take advantage of organic solvent-free water spin-coating and tetramethylammonium hydroxide(TMAH)-free water-developable techniques. A water developable, non-chemically amplified, high sensitive, and negative tone resist material in EB lithography was developed for environmental affair, safety, easiness of handling, and health of the working people, instead of the common developable process of TMAH. The material design concept to use the water-soluble resist material with acceptable properties such as pillar patterns with less than 100 nm in high EB sensitivity of 10 μC/cm2 and etch selectivity with a silicon-based middle layer in CF4 plasma treatment was demonstrated for EB and EUV lithography.

Unique Capabilities of the SUVI Telescopes For Both Space Weather Prediction and Fundamental Solar Physics

NASA Astrophysics Data System (ADS)

Slater, G. L.; Seaton, D. B.

2017-12-01

The recently launched Solar UltraViolet Imager (SUVI) aboard NOAA's GOES-16 satellite, provides image data that can potentially both improve earth effective solar storm predictions and contribute to fundamental research on structure and dynamics in what may be called the 'high EUV corona'. The wide field of view ( 53 x 53 arcmin) and passband set covering UV and EUV emission from plasmas ranging in temperature from 5000 K to 7 million K, allow for the detailed observation of structure and dynamics in the high EUV corona. Imaging this region is increasingly recognized as being critical to understanding how the low corona connects, disconnects from, and reconnects to, the high corona and heliosphere during transient events in the low corona. We will illustrate this claim with observations taken from the first few months on operation of the SUVI instrument.

50-mJ, 1-kHz Yb:YAG thin-disk regenerative amplifier with 969-nm pulsed pumping

NASA Astrophysics Data System (ADS)

Chyla, Michal; Miura, Taisuke; Smrž, Martin; Severova, Patricie; Novak, Ondrej; Endo, Akira; Mocek, Tomas

2014-02-01

We are developing a 100-mJ Yb:YAG thin-disk regenerative amplifier operating at 1-kHz repetition rate pumped at zero-phonon-line (968.825-nm1) and delivering 1-2 ps pulses for EUV plasma sources applicable in science and industry. Recently we achieved the output energy of nearly 50-mJ from a single laser-head cavity with good beam quality (M2<1.2) as well as stable beam-pointing (<4μrad). Applying pulsed pumping with the pulse duration shorter than the upper state lifetime of Yb:YAG helps to reduce the ASE and thermal loading of the thin-disk.

Method and apparatus for inspecting an EUV mask blank

DOEpatents

Goldberg, Kenneth A.

2005-11-08

An apparatus and method for at-wavelength EUV mask-blank characterization for inspection of moderate and low spatial frequency coating uniformity using a synchrotron or other source of EUV light. The apparatus provides for rapid, non-destruction, non-contact, at-wavelength qualification of large mask areas, and can be self-calibrating or be calibrated to well-characterized reference samples. It can further check for spatial variation of mask reflectivity or for global differences among masks. The apparatus and method is particularly suited for inspection of coating uniformity and quality and can detect defects in the order of 50 .mu.m and above.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bitter, M; Hill, K W; Scott, S

This paper consists of two parts: Part I describes the working principle of a recently developed x-ray imaging crystal spectrometer, where the astigmatism of spherically bent crystals is being used with advantage to record spatially resolved spectra of highly charged ions for Doppler measurements of the ion-temperature and toroidal plasmarotation- velocity profiles in tokamak plasmas. This type of spectrometer was thoroughly tested on NSTX and Alcator C-Mod, and its concept was recently adopted for the design of the ITER crystal spectrometers. Part II describes imaging schemes, where the astigmatism has been eliminated by the use of matched pairs of sphericallymore » bent crystals or reflectors. These imaging schemes are applicable over a wide range of the electromagnetic radiation, which includes microwaves, visible light, EUV radiation, and x-rays. Potential applications with EUV radiation and x-rays are the diagnosis of laserproduced plasmas, imaging of biological samples with synchrotron radiation, and lithography.« less

Probing the Quiet Solar Atmosphere from the Photosphere to the Corona

NASA Astrophysics Data System (ADS)

Kontogiannis, Ioannis; Gontikakis, Costis; Tsiropoula, Georgia; Tziotziou, Kostas

2018-04-01

We investigate the morphology and temporal variability of a quiet-Sun network region in different solar layers. The emission in several extreme ultraviolet (EUV) spectral lines through both raster and slot time-series, recorded by the EUV Imaging Spectrometer (EIS) on board the Hinode spacecraft is studied along with Hα observations and high-resolution spectropolarimetric observations of the photospheric magnetic field. The photospheric magnetic field is extrapolated up to the corona, showing a multitude of large- and small-scale structures. We show for the first time that the smallest magnetic structures at both the network and internetwork contribute significantly to the emission in EUV lines, with temperatures ranging from 8× 104 K to 6× 105 K. Two components of transition region emission are present, one associated with small-scale loops that do not reach coronal temperatures, and another component that acts as an interface between coronal and chromospheric plasma. Both components are associated with persistent chromospheric structures. The temporal variability of the EUV intensity at the network region is also associated with chromospheric motions, pointing to a connection between transition region and chromospheric features. Intensity enhancements in the EUV transition region lines are preferentially produced by Hα upflows. Examination of two individual chromospheric jets shows that their evolution is associated with intensity variations in transition region and coronal temperatures.

The EUV Helium Spectrum in the Quiet Sun: A By-Product of Coronal Emission?

NASA Technical Reports Server (NTRS)

Andretta, Vincenzo; DelZanna, Giulio; Jordan, Stuart D.; Oegerle, William (Technical Monitor)

2002-01-01

In this paper we test one of the mechanisms proposed to explain the intensities and other observed properties of the solar helium spectrum, and in particular of its Extreme-Ultraviolet (EUV) resonance lines. The so-called Photoionisation-Recombination (P-R) mechanism involves photoionisation of helium atoms and ions by EUV coronal radiation, followed by recombination cascades. We present calibrated measurements of EUV flux obtained with the two CDS spectrometers on board SOHO, in quiescent solar regions. We were able to obtain an essentially complete estimate of the total photoionizing flux in the wavelength range below 504 A (the photoionisation threshold for He(I)), as well as simultaneous measurements with the same instruments of the intensities of the strongest EUV helium lines: He(II) lambda304, He(I) lambda584, and He(I) lambda537. We find that there are not enough EUV photons to account for the observed helium line intensities. More specifically, we conclude that He(II) intensities cannot be explained by the P-R mechanism. Our results, however, leave open the possibility that the He(I) spectrum could be formed by the P-R mechanism, with the He(II) lambda304 line as a significant photoionizating source.

Simultaneous ASCA and EUVE Observations of Capella

NASA Astrophysics Data System (ADS)

Brickhouse, N. S.; Dupree, A. K.; Edgar, R. J.; Drake, S. A.; White, N. E.; Liedahl, D. A.; Singh, K. P.

1997-05-01

We present simultaneous observations taken in Mar 1996 of the bright stellar coronal source Capella (HD 34029) with the ASCA and EUVE satellites. Previous EUVE observations of Fe emission lines (Fe VIII --- XXIV, excluding XVII) revealed a narrow emission measure feature at 6 x 10(6) K, which has proven to be remarkably stable over several years (flux from Fe XVIII and XIX has not varied by more than 30%), while lines formed at higher temperatures have shown intensity variations up to factors of 4. Furthermore, extremely high signal-to-noise spectra obtained by summing all EUVE measurements show that the Fe/H abundance ratio is consistent with solar photospheric. (See Dupree et al. 1993, ApJ, 418, L41; Brickhouse, Raymond, & Smith 1995, ApJSupp, 97, 551; Brickhouse 1996, IAU Coll. 152, Astrophysics in the Extreme Ultraviolet, Bowyer & Malina, eds (Kluwer), 141.) Meanwhile, the ASCA data of Capella have proven notoriously difficult to analyze. The performance verification (PV) phase data suggested a somewhat subsolar Fe abundance, but models were in poor agreement with the data (chi (2red) ~ 6). (See Drake 1996, Conf. on Cosmic Abundances, U. Maryland). Since the emission lines observed by EUVE are formed at the same emitting temperatures as the X-ray spectrum (Capella is ``soft'' such that very little flux is observed above 2 keV), the emission measure distribution derived from EUVE lines should provide a direct prediction of the X-ray spectrum, with only the relative abundances of species other than Fe as free parameters. Like the PV data, the new ASCA spectrum is not well fit by any of the standard models. Applying the constraints imposed by EUVE does not make a major improvement in the fit --- multi-thermal, variable abundance models such as Raymond-Smith and MEKAL do not provide any acceptable fit (chi (2red) > 5). We discuss our efforts to understand the X-ray spectrum, including studies of the uncertainties in the atomic data and of the underlying assumptions of the source models.

Coulomb thermal properties and stability of the Io plasma torus

NASA Technical Reports Server (NTRS)

Barbosa, D. D.; Coroniti, F. V.; Eviatar, A.

1983-01-01

Coulomb collisional energy exchange rates are computed for a model of the Io plasma torus consisting of newly created pickup ions, a background of thermally degraded intermediary ions, and a population of cooler electrons. The electrons are collisionally heated by both the pickup ions and background ions and are cooled by electron impact excitation of plasma ions which radiate in the EUV. It is found that a relative concentration of S III pickup ions forbidden S III/electrons = 0.1 with a temperature of 340 eV can deliver energy to the electrons at a rate of 3 x 10 to the -13th erg/cu cm per sec, sufficient to power the EUV emissions in the Io torus. The model predicts a background ion temperature Ti of about 53 eV and an electron temperature Te of about 5.5 eV on the basis of steady-state energy balance relations at Coulomb rates. The model also predicts electron temperature fluctuations at the 30 percent level on a time scale of less than 11 hours, consistent with recent observations of this phenomenon.

The Formation and Early Evolution of a CME and the Associated Shock on 2014 January 8

NASA Astrophysics Data System (ADS)

Wan, Linfeng; Cheng, Xin; Shi, Tong; Su, Wei; Ding, Mingde

2017-08-01

We study the formation and early evolution of a limb coronal mass ejection (CME) and its associated shock wave that occurred on 2014 January 8. The extreme ultraviolet (EUV) images provided by AIA on board \\textit{Solar Dynamics Observatory} disclose that the CME first appears as a bubble-like structure. Subsequently, its expansion forms the CME and causes a quasi-circular EUV wave. Both the CME and the wave front are clearly visible at all of the AIA EUV passbands. Through a detailed kinematical analysis, it is found that the expansion of the CME undergoes two phases: a first phase with a strong but transient lateral over-expansion followed by a second phase with a self-similar expansion. The temporal evolution of the expansion velocity coincides very well with the variation of the 25--50 keV hard X-ray (HXR) flux of the associated flare, which indicates that magnetic reconnection most likely plays an important role in driving the expansion. Moreover, we find that, when the velocity of the CME reaches $\\sim$600 km s$^{-1}$, the EUV wave starts to evolve into a shock wave, which is evidenced by the appearance of a type II radio burst. Interestingly, we also notice an unusual solar radio signal at $\\sim$4 GHz that is similar to the pattern of a type II radio burst but drifts to higher frequencies at a rate of $\\sim$0.3 MHz per second during about 7 minutes. Its derived density is $\\sim$5$\\times$10$^{10}$ cm$^{-3}$ and increases slowly with time. Joint imaging observations of HXR and EUV help to locate the loop-top region and calculate its thermal proprieties, including slowly increasing densities ($\\sim$5$\\times$10$^{10}$ cm$^{-3}$) and temperatures ($\\sim$14 MK). The similar results obtained from two different ways above imply the possibility of this scenario: plasma blobs that are ejected along the current sheet via magnetic reconnection collide with underlying flare loops that are undergoing chromospheric evaporation. Finally, we also study the thermal properties of the CME and the EUV wave. We find that the plasma in the CME leading front and the wave front has a temperature of $\\sim$2 MK, while that in the CME core region and the flare region has a much higher temperature of $\\ge$8 MK.

Brightness and magnetic evolution of solar coronal bright points

NASA Astrophysics Data System (ADS)

Ugarte-Urra, I.

2004-12-01

This thesis presents a study of the brightness and magnetic evolution of several Extreme ultraviolet (EUV) coronal bright points (hereafter BPs). BPs are loop-like features of enhanced emission in the coronal EUV and X-ray images of the Sun, that are associated to the interaction of opposite photospheric magnetic polarities with magnetic fluxes of ≈1018 - 1019 Mx. The study was carried out using several instruments on board the Solar and Heliospheric Observatory (SOHO): the Extreme Ultraviolet Imager (EIT), the Coronal Diagnostic Spectrometer (CDS) and the Michelson Doppler Imager (MDI), supported by the high resolution imaging from the Transition Region And Coronal Explorer (TRACE). The results confirm that, down to 1'' (i.e. ~715 km) resolution, BPs are made of small loops with lengths of ~6 Mm and cross-sections of ~2 Mm. The loops are very dynamic, evolving in time scales as short as 1 - 2 minutes. This is reflected in a highly variable EUV response with fluctuations highly correlated in spectral lines at transition region temperatures (in the range 3.2x10^4 - 3.5x10^5 K), but not always at coronal temperatures. A wavelet analysis of the intensity variations reveals, for the first time, the existence of quasi-periodic oscillations with periods ranging 400 -- 1000 s, in the range of periods characteristic of the chromospheric network. The link between BPs and network bright points is discussed, as well as the interpretation of the oscillations in terms of global acoustic modes of closed magnetic structures. A comparison of the magnetic flux evolution of the magnetic polarities to the EUV flux changes is also presented. Throughout their lifetime, the intrinsic EUV emission of BPs is found to be dependent on the total magnetic flux of the polarities. In short time scales, co-spatial and co-temporal TRACE and MDI images, reveal the signature of heating events that produce sudden EUV brightenings simultaneous to magnetic flux cancellations. This is interpreted in terms of magnetic reconnection events. Finally, a electron density study of six coronal bright points produces values of ~1.6x109 cm-3, closer to active region plasma than to quiet Sun. The analysis of a large coronal loop (half length of 72 Mm) introduces the discussion on the prospects of future plasma diagnostics of BPs with forthcoming solar missions like Solar-B.

Anti-parallel EUV Flows Observed along Active Region Filament Threads with Hi-C

NASA Astrophysics Data System (ADS)

Alexander, Caroline E.; Walsh, Robert W.; Régnier, Stéphane; Cirtain, Jonathan; Winebarger, Amy R.; Golub, Leon; Kobayashi, Ken; Platt, Simon; Mitchell, Nick; Korreck, Kelly; DePontieu, Bart; DeForest, Craig; Weber, Mark; Title, Alan; Kuzin, Sergey

2013-09-01

Plasma flows within prominences/filaments have been observed for many years and hold valuable clues concerning the mass and energy balance within these structures. Previous observations of these flows primarily come from Hα and cool extreme-ultraviolet (EUV) lines (e.g., 304 Å) where estimates of the size of the prominence threads has been limited by the resolution of the available instrumentation. Evidence of "counter-steaming" flows has previously been inferred from these cool plasma observations, but now, for the first time, these flows have been directly imaged along fundamental filament threads within the million degree corona (at 193 Å). In this work, we present observations of an AR filament observed with the High-resolution Coronal Imager (Hi-C) that exhibits anti-parallel flows along adjacent filament threads. Complementary data from the Solar Dynamics Observatory (SDO)/Atmospheric Imaging Assembly (AIA) and Helioseismic and Magnetic Imager are presented. The ultra-high spatial and temporal resolution of Hi-C allow the anti-parallel flow velocities to be measured (70-80 km s-1) and gives an indication of the resolvable thickness of the individual strands (0.''8 ± 0.''1). The temperature of the plasma flows was estimated to be log T (K) = 5.45 ± 0.10 using Emission Measure loci analysis. We find that SDO/AIA cannot clearly observe these anti-parallel flows or measure their velocity or thread width due to its larger pixel size. We suggest that anti-parallel/counter-streaming flows are likely commonplace within all filaments and are currently not observed in EUV due to current instrument spatial resolution.

Correlations Between Variations in Solar EUV and Soft X-Ray Irradiance and Photoelectron Energy Spectra Observed on Mars and Earth

NASA Technical Reports Server (NTRS)

Peterson, W. K.; Brain, D. A.; Mitchell, D. L.; Bailey, S. M.; Chamberlin, P. C.

2013-01-01

Solar extreme ultraviolet (EUV; 10-120 nm) and soft X-ray (XUV; 0-10 nm) radiation are major heat sources for the Mars thermosphere as well as the primary source of ionization that creates the ionosphere. In investigations of Mars thermospheric chemistry and dynamics, solar irradiance models are used to account for variations in this radiation. Because of limited proxies, irradiance models do a poor job of tracking the significant variations in irradiance intensity in the EUV and XUV ranges over solar rotation time scales when the Mars-Sun-Earth angle is large. Recent results from Earth observations show that variations in photoelectron energy spectra are useful monitors of EUV and XUV irradiance variability. Here we investigate photoelectron energy spectra observed by the Mars Global Surveyor (MGS) Electron Reflectometer (ER) and the FAST satellite during the interval in 2005 when Earth, Mars, and the Sun were aligned. The Earth photoelectron data in selected bands correlate well with calculations based on 1 nm resolution observations above 27 nm supplemented by broadband observations and a solar model in the 0-27 nm range. At Mars, we find that instrumental and orbital limitations to the identifications of photoelectron energy spectra in MGS/ER data preclude their use as a monitor of solar EUV and XUV variability. However, observations with higher temporal and energy resolution obtained at lower altitudes on Mars might allow the separation of the solar wind and ionospheric components of electron energy spectra so that they could be used as reliable monitors of variations in solar EUV and XUV irradiance than the time shifted, Earth-based, F(10.7) index currently used.

Correlations between variations in solar EUV and soft X-ray irradiance and photoelectron energy spectra observed on Mars and Earth

NASA Astrophysics Data System (ADS)

Peterson, W. K.; Brain, D. A.; Mitchell, D. L.; Bailey, S. M.; Chamberlin, P. C.

2013-11-01

extreme ultraviolet (EUV; 10-120 nm) and soft X-ray (XUV; 0-10 nm) radiation are major heat sources for the Mars thermosphere as well as the primary source of ionization that creates the ionosphere. In investigations of Mars thermospheric chemistry and dynamics, solar irradiance models are used to account for variations in this radiation. Because of limited proxies, irradiance models do a poor job of tracking the significant variations in irradiance intensity in the EUV and XUV ranges over solar rotation time scales when the Mars-Sun-Earth angle is large. Recent results from Earth observations show that variations in photoelectron energy spectra are useful monitors of EUV and XUV irradiance variability. Here we investigate photoelectron energy spectra observed by the Mars Global Surveyor (MGS) Electron Reflectometer (ER) and the FAST satellite during the interval in 2005 when Earth, Mars, and the Sun were aligned. The Earth photoelectron data in selected bands correlate well with calculations based on 1 nm resolution observations above 27 nm supplemented by broadband observations and a solar model in the 0-27 nm range. At Mars, we find that instrumental and orbital limitations to the identifications of photoelectron energy spectra in MGS/ER data preclude their use as a monitor of solar EUV and XUV variability. However, observations with higher temporal and energy resolution obtained at lower altitudes on Mars might allow the separation of the solar wind and ionospheric components of electron energy spectra so that they could be used as reliable monitors of variations in solar EUV and XUV irradiance than the time shifted, Earth-based, F10.7 index currently used.

Discovery of Strong EUV-induced Balmer Emission in the New WD+dM Binary EUVE J2013+40.0 (RE 2013+400)

NASA Astrophysics Data System (ADS)

Thorstensen, J. R.; Vennes, S.

1993-12-01

The binary system EUVE J2013+40.0 (= RE 2013+400) was discovered in the EUV-selected sample of white dwarfs identified in the course of the ROSAT Wide Field Camera (WFC) all-sky survey (Pounds et al. 1993, MNRAS, 260, 77). The intense extreme ultraviolet (EUV) emission from the hot white dwarf (DAO type) was also detected in the course of the Extreme Ultraviolet Explorer (EUVE) all-sky survey (Bowyer et al. 1993, ApJ, submitted), and the subsequent optical identification campaign suggested the association of EUVE J2013+40.0 with the Feige 24 class of binary systems (see Vennes & Thorstensen, these proceedings). Such systems consist of a hot H-rich white dwarf (DA/DAO) and a red dwarf companion (dM) and are characterized by strong, narrow, variable Balmer emission. We obtained spectroscopy with 4 Angstroms resolution at the Michigan-Dartmouth-MIT Hiltner 2.4 m, covering the Hα and Hβ range. The Hα emission line velocity and equivalent widths varied with a period of 0.708 +/- 0.003 d; the velocity semiamplitude is 89 +/- 3 km s(-1) . The emission equivalent width reaches maximum strength 0.251 +/- 0.007 cycle after maximum emission-line velocity, that is, when the emission source reaches superior conjunction. This is just as expected if the emission arises from reprocessing of the EUV radiation incident upon the face of the dM star facing the white dwarf, as proposed for Feige 24 by Thorstensen et al. (1978, ApJ, 223, 260). EUVE J2013+40.0 is one of a handful of WD+dM binary systems in which the illumination effect is observed with unambiguous clarity. By comparing Feige 24 and EUVE J2013+40.0, and modelling the white dwarf EUV emission and red dwarf Balmer emission, we constrain the orbital inclinations. Additional spectroscopy of EUVE J2013+40.0 is being scheduled to determine the component masses. These are important input data for the study of the close binary systems which arise from common envelope evolution. This work is supported by a forthcoming NASA Guest Observer grant.

High-resolution He I 10830 Å Narrowband Imaging for an M-class Flare. II. Multiple Hot Channels: Their Origin and Destination

NASA Astrophysics Data System (ADS)

Wang, Ya; Su, Yingna; Shen, Jinhua; Yang, Xu; Cao, Wenda; Ji, Haisheng

2018-06-01

In this paper, we report our second-part result for the M1.8 class flare on 2012 July 5, with an emphasis on the initiation process for the flare-associated filament eruption. The data set consists of high-resolution narrowband images in He I 10830 Å and broadband images in TiO 7057 Å taken at Big Bear Solar Observatory with the 1.6 m aperture Goode Solar Telescope. EUV images in different passbands observed by the Atmospheric Imaging Assembly on board the Solar Dynamics Observatory are used to distinguish hot plasma from cool plasma structures during the flare process. High-resolution 10830 Å images clearly show that, below the horizontal fibrils, which correspond to the filament’s spine in full-disk Hα images, a sheared arch filament system (AFS) lies across the penumbra and surrounding satellite sunspots, between which continuous shearing motion is observed. Before the eruption, three microflares occurred successively and were followed by the appearance of three EUV hot channels. Two hot channels erupted, producing two flaring sites and two major peaks in GOES soft X-ray light curves; however, one hot channel’s eruption failed. The 10830 Å imaging enables us to trace the first two hot channels to their very early stage, which is signified by the rising of the AFS after the first two precursors. Continuous flux emergence and localized flare-associated cancellation are observed under the AFS. In addition, EUV ejections were observed during the formation of the EUV hot channels. These observations support the fact that the hot channels are the result of magnetic reconnections during precursors.

ANALYSIS AND MODELING OF TWO FLARE LOOPS OBSERVED BY AIA AND EIS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Li, Y.; Ding, M. D.; Qiu, J.

2012-10-10

We analyze and model an M1.0 flare observed by SDO/AIA and Hinode/EIS to investigate how flare loops are heated and evolve subsequently. The flare is composed of two distinctive loop systems observed in extreme ultraviolet (EUV) images. The UV 1600 A emission at the feet of these loops exhibits a rapid rise, followed by enhanced emission in different EUV channels observed by the Atmospheric Imaging Assembly (AIA) and the EUV Imaging Spectrometer (EIS). Such behavior is indicative of impulsive energy deposit and the subsequent response in overlying coronal loops that evolve through different temperatures. Using the method we recently developed,more » we infer empirical heating functions from the rapid rise of the UV light curves for the two loop systems, respectively, treating them as two big loops with cross-sectional area of 5'' by 5'', and compute the plasma evolution in the loops using the EBTEL model. We compute the synthetic EUV light curves, which, with the limitation of the model, reasonably agree with observed light curves obtained in multiple AIA channels and EIS lines: they show the same evolution trend and their magnitudes are comparable by within a factor of two. Furthermore, we also compare the computed mean enthalpy flow velocity with the Doppler shift measurements by EIS during the decay phase of the two loops. Our results suggest that the two different loops with different heating functions as inferred from their footpoint UV emission, combined with their different lengths as measured from imaging observations, give rise to different coronal plasma evolution patterns captured both in the model and in observations.« less

UNDERCOVER EUV SOLAR JETS OBSERVED BY THE INTERFACE REGION IMAGING SPECTROGRAPH

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chen, N.-H.; Innes, D. E.

It is well-known that extreme ultraviolet (EUV) emission emitted at the solar surface is absorbed by overlying cool plasma. Especially in active regions, dark lanes in EUV images suggest that much of the surface activity is obscured. Simultaneous observations from the Interface Region Imaging Spectrograph, consisting of UV spectra and slit-jaw images (SJI), give vital information with sub-arcsecond spatial resolution on the dynamics of jets not seen in EUV images. We studied a series of small jets from recently formed bipole pairs beside the trailing spot of active region 11991, which occurred on 2014 March 5 from 15:02:21 UT tomore » 17:04:07 UT. Collimated outflows with bright roots were present in SJI 1400 Å (transition region) and 2796 Å (upper chromosphere) that were mostly not seen in Atmospheric Imaging Assembly (AIA) 304 Å (transition region) and AIA 171 Å (lower corona) images. The Si iv spectra show a strong blue wing enhancement, but no red wing, in the line profiles of the ejecta for all recurrent jets, indicating outward flows without twists. We see two types of Mg ii line profiles produced by the jets spires: reversed and non-reversed. Mg ii lines remain optically thick, but turn optically thin in the highly Doppler shifted wings. The energy flux contained in each recurrent jet is estimated using a velocity differential emission measure technique that measures the emitting power of the plasma as a function of the line-of-sight velocity. We found that all the recurrent jets release similar energy (10{sup 8} erg cm{sup −2} s{sup −1}) toward the corona and the downward component is less than 3%.« less

Undercover EUV Solar Jets Observed by the Interface Region Imaging Spectrograph

NASA Astrophysics Data System (ADS)

Chen, N.-H.; Innes, D. E.

2016-12-01

It is well-known that extreme ultraviolet (EUV) emission emitted at the solar surface is absorbed by overlying cool plasma. Especially in active regions, dark lanes in EUV images suggest that much of the surface activity is obscured. Simultaneous observations from the Interface Region Imaging Spectrograph, consisting of UV spectra and slit-jaw images (SJI), give vital information with sub-arcsecond spatial resolution on the dynamics of jets not seen in EUV images. We studied a series of small jets from recently formed bipole pairs beside the trailing spot of active region 11991, which occurred on 2014 March 5 from 15:02:21 UT to 17:04:07 UT. Collimated outflows with bright roots were present in SJI 1400 Å (transition region) and 2796 Å (upper chromosphere) that were mostly not seen in Atmospheric Imaging Assembly (AIA) 304 Å (transition region) and AIA 171 Å (lower corona) images. The Si IV spectra show a strong blue wing enhancement, but no red wing, in the line profiles of the ejecta for all recurrent jets, indicating outward flows without twists. We see two types of Mg II line profiles produced by the jets spires: reversed and non-reversed. Mg II lines remain optically thick, but turn optically thin in the highly Doppler shifted wings. The energy flux contained in each recurrent jet is estimated using a velocity differential emission measure technique that measures the emitting power of the plasma as a function of the line-of-sight velocity. We found that all the recurrent jets release similar energy (108 erg cm-2 s-1) toward the corona and the downward component is less than 3%.

ILT optimization of EUV masks for sub-7nm lithography

NASA Astrophysics Data System (ADS)

Hooker, Kevin; Kuechler, Bernd; Kazarian, Aram; Xiao, Guangming; Lucas, Kevin

2017-06-01

The 5nm and 7nm technology nodes will continue recent scaling trends and will deliver significantly smaller minimum features, standard cell areas and SRAM cell areas vs. the 10nm node. There are tremendous economic pressures to shrink each subsequent technology, though in a cost-effective and performance enhancing manner. IC manufacturers are eagerly awaiting EUV so that they can more aggressively shrink their technology than they could by using complicated MPT. The current 0.33NA EUV tools and processes also have their patterning limitations. EUV scanner lenses, scanner sources, masks and resists are all relatively immature compared to the current lithography manufacturing baseline of 193i. For example, lens aberrations are currently several times larger (as a function of wavelength) in EUV scanners than for 193i scanners. Robustly patterning 16nm L/S fully random logic metal patterns and 40nm pitch random logic rectangular contacts with 0.33NA EUV are tough challenges that will benefit from advanced OPC/RET. For example, if an IC manufacturer can push single exposure device layer resolution 10% tighter using improved ILT to avoid using DPT, there will be a significant cost and process complexity benefit to doing so. ILT is well known to have considerable benefits in finding flexible 193i mask pattern solutions to improve process window, improve 2D CD control, improve resolution in low K1 lithography regime and help to delay the introduction of DPT. However, ILT has not previously been applied to EUV lithography. In this paper, we report on new developments which extend ILT method to EUV lithography and we characterize the benefits seen vs. traditional EUV OPC/RET methods.

The novel top-coat material for RLS trade-off reduction in EUVL

NASA Astrophysics Data System (ADS)

Onishi, Ryuji; Sakamoto, Rikimaru; Fujitani, Noriaki; Endo, Takafumi; Ho, Bang-ching

2012-03-01

For the next generation lithography (NGL), several technologies have been proposed to achieve the 22nm-node devices and beyond. Extreme ultraviolet (EUV) lithography is one of the candidates for the next generation lithography. In EUV light source development, low power is one of the critical issue because of the low throughput, and another issue is Out of Band (OoB) light existing in EUV light. OoB is concerned to be the cause of deterioration for the lithography performance. In order to avoid this critical issue, we focused on development of the resist top coat material with OoB absorption property as Out of Band Protection Layer (OBPL). We designed this material having high absorbance around 240nm wavelength and high transmittance for EUV light. And this material aimed to improve sensitivity, resolution and LWR performance.

Berkeley extreme-ultraviolet airglow rocket spectrometer - BEARS

NASA Technical Reports Server (NTRS)

Cotton, D. M.; Chakrabarti, S.

1992-01-01

The Berkeley EUV airglow rocket spectrometer (BEARS) instrument is described. The instrument was designed in particular to measure the dominant lines of atomic oxygen in the FUV and EUV dayglow at 1356, 1304, 1027, and 989 A, which is the ultimate source of airglow emissions. The optical and mechanical design of the instrument, the detector, electronics, calibration, flight operations, and results are examined.

The EUV-observatory TESIS on board Coronas-Photon: scientific goals and initial plan of observations

NASA Astrophysics Data System (ADS)

Bogachev, Sergey

The TESIS a EUV-observatory for solar research from space will be launched in 2008 September on board the satellite Coronas-Photon from cosmodrome Plesetsk. TESIS is a project of Lebedev Physical Institute of Russian Academy of Science with contribution from Space Research Center of Polish Academy of Science (the spectrometer SphinX). The experiment will focus on quasi-monochromatic imaging of the Sun and XUV spectroscopy of solar plasma. The scientific payload of TESIS contains five instruments: (1) Bragg crystal spectroheliometer for Sun monochromatic imaging in the line MgXII 8.42 A, (2) the normal-incidence Herschelian EUV telescopes with a resolution of 1.7 arc sec operated in lines FeXXII 133 A, FeIX 171 A and HeII 304 A, (3) the EUV imaging spectrometer, (4) the wide-field Ritchey-Chretien coronograph and (5) the X-ray spectrometer SphinX. The TESIS will focus on coordinated study of solar activity from the transition region to the outer corona up to 4 solar radii in wide temperature range from 5*104 to 2*107 K. We describe the scientific goals of the TESIS and its initial plan of observations.

A very small and super strong zebra pattern burst at the beginning of a solar flare

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tan, Baolin; Tan, Chengming; Zhang, Yin

2014-08-01

Microwave emission with spectral zebra pattern structures (ZPs) is frequently observed in solar flares and the Crab pulsar. The previous observations show that ZP is a structure only overlapped on the underlying broadband continuum with slight increments and decrements. This work reports an unusually strong ZP burst occurring at the beginning of a solar flare observed simultaneously by two radio telescopes located in China and the Czech Republic and by the EUV telescope on board NASA's satellite Solar Dynamics Observatory on 2013 April 11. It is a very short and super strong explosion whose intensity exceeds several times that ofmore » the underlying flaring broadband continuum emission, lasting for just 18 s. EUV images show that the flare starts from several small flare bursting points (FBPs). There is a sudden EUV flash with extra enhancement in one of these FBPs during the ZP burst. Analysis indicates that the ZP burst accompanying an EUV flash is an unusual explosion revealing a strong coherent process with rapid particle acceleration, violent energy release, and fast plasma heating simultaneously in a small region with a short duration just at the beginning of the flare.« less

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bučík, Radoslav; Innes, Davina E.; Mason, Glenn M.

Small, {sup 3}He-rich solar energetic particle (SEP) events have been commonly associated with extreme-ultraviolet (EUV) jets and narrow coronal mass ejections (CMEs) that are believed to be the signatures of magnetic reconnection, involving field lines open to interplanetary space. The elemental and isotopic fractionation in these events are thought to be caused by processes confined to the flare sites. In this study, we identify 32 {sup 3}He-rich SEP events observed by the Advanced Composition Explorer , near the Earth, during the solar minimum period 2007–2010, and we examine their solar sources with the high resolution Solar Terrestrial Relations Observatory (more » STEREO ) EUV images. Leading the Earth, STEREO -A has provided, for the first time, a direct view on {sup 3}He-rich flares, which are generally located on the Sun’s western hemisphere. Surprisingly, we find that about half of the {sup 3}He-rich SEP events in this survey are associated with large-scale EUV coronal waves. An examination of the wave front propagation, the source-flare distribution, and the coronal magnetic field connections suggests that the EUV waves may affect the injection of {sup 3}He-rich SEPs into interplanetary space.« less

Earth-orbiting extreme ultraviolet spectroscopic mission: SPRINT-A/EXCEED

NASA Astrophysics Data System (ADS)

Yoshikawa, I.; Tsuchiya, F.; Yamazaki, A.; Yoshioka, K.; Uemizu, K.; Murakami, G.; Kimura, T.; Kagitani, M.; Terada, N.; Kasaba, Y.; Sakanoi, T.; Ishii, H.; Uji, K.

2012-09-01

The EXCEED (Extreme Ultraviolet Spectroscope for Exospheric Dynamics) mission is an Earth-orbiting extreme ultraviolet (EUV) spectroscopic mission and the first in the SPRINT series being developed by ISAS/JAXA. It will be launched in the summer of 2013. EUV spectroscopy is suitable for observing tenuous gases and plasmas around planets in the solar system (e.g., Mercury, Venus, Mars, Jupiter, and Saturn). Advantage of remote sensing observation is to take a direct picture of the plasma dynamics and distinguish between spatial and temporal variability explicitly. One of the primary observation targets is an inner magnetosphere of Jupiter, whose plasma dynamics is dominated by planetary rotation. Previous observations have shown a few percents of the hot electron population in the inner magnetosphere whose temperature is 100 times higher than the background thermal electrons. Though the hot electrons have a significant impact on the energy balance in the inner magnetosphere, their generation process has not yet been elucidated. In the EUV range, a number of emission lines originate from plasmas distributed in Jupiter's inner magnetosphere. The EXCEED spectrograph is designed to have a wavelength range of 55-145 nm with minimum spectral resolution of 0.4 nm, enabling the electron temperature and ion composition in the inner magnetosphere to be determined. Another primary objective is to investigate an unresolved problem concerning the escape of the atmosphere to space. Although there have been some in-situ observations by orbiters, our knowledge is still limited. The EXCEED mission plans to make imaging observations of plasmas around Venus and Mars to determine the amounts of escaping atmosphere. The instrument's field of view (FOV) is so wide that we can get an image from the interaction region between the solar wind and planetary plasmas down to the tail region at one time. This will provide us with information about outward-flowing plasmas, e.g., their composition, rate, and dependence on solar activity. EXCEED has two mission instruments: the EUV spectrograph and a target guide camera that is sensitive to visible light. The EUV spectrograph is designed to have a wavelength range of 55-145 nm with a spectral resolution of 0.4-1.0 nm. The spectrograph slits have a FOV of 400 x 140 arcseconds (maximum). The optics of the instrument consists of a primary mirror with a diameter of 20cm, a laminar type grating, and a 5-stage micro-channel plate assembly with a resistive anode encoder. To achieve high efficiencies, the surfaces of the primary mirror and the grating are coated with CVD-SiC. Because of the large primary mirror and high efficiencies, good temporal resolution and complete spatial coverage for Io plasma torus observation is expected. Based on a feasibility study using the spectral diagnosis method, it is shown that EXCEED can determine the Io plasma torus parameters, such as the electron density, temperatures, hot electron fraction and so on, using an exposure time of 50 minutes. The target guide camera will be used to capture the target and guide the observation area of interest to the slit. Emissions from outside the slit's FOV will be reflected by the front of the slit and guided to the target guide camera. The guide camera's FOV is 240" x 240". The camera will take an image every 3 seconds and the image is sent to a mission data processor (MDP), which calculates the centroid of the image. During an observation, the bus system controls the attitude to keep the centroid position of the target in the guide camera with an accuracy of ±5 arc-seconds. With the help of the target guide camera, we will take spectral images with a long exposure time of 50 minutes and good spatial resolution of 20 arc-seconds.

AtomDB Progress Report: Atomic data and new models for X-ray spectroscopy.

NASA Astrophysics Data System (ADS)

Smith, Randall K.; Foster, Adam; Brickhouse, Nancy S.; Stancil, Phillip C.; Cumbee, Renata; Mullen, Patrick Dean; AtomDB Team

2018-06-01

The AtomDB project collects atomic data from both theoretical and observational/experimental sources, providing both a convenient interface (http://www.atomdb.org/Webguide/webguide.php) as well as providing input to spectral models for many types of astrophysical X-ray plasmas. We have released several updates to AtomDB in response to the Hitomi data, including new data for the Fe K complex, and have expanded the range of models available in AtomDB to include the Kronos charge exchange models from Mullen at al. (2016, ApJS, 224, 2). Combined with the previous AtomDB charge exchange model (http://www.atomdb.org/CX/), these data enable a velocity-dependent model for X-ray and EUV charge exchange spectra. We also present a new Kappa-distribution spectral model, enabling plasmas with non-Maxwellian electron distributions to be modeled with AtomDB. Tools are provided within pyAtomDB to explore and exploit these new plasma models. This presentation will review these enhancements and describe plans for the new few years of database and code development in preparation for XARM, Athena, and (hopefully) Arcus.

ROSAT EUV and soft X-ray studies of atmospheric composition and structure in G191-B2B

NASA Technical Reports Server (NTRS)

Barstow, M. A.; Fleming, T. A.; Finley, D. S.; Koester, D.; Diamond, C. J.

1993-01-01

Previous studies of the hot DA white dwarf GI91-B2B have been unable to determine whether the observed soft X-ray and EUV opacity arises from a stratified hydrogen and helium atmosphere or from the presence of trace metals in the photosphere. New EUV and soft X-ray photometry of this star, made with the ROSAT observatory, when analyzed in conjunction with the earlier data, shows that the stratified models cannot account for the observed fluxes. Consequently, we conclude that trace metals must be a substantial source of opacity in the photosphere of G191-B2B.

EUV and Magnetic Activities Associated with Type-I Solar Radio Bursts

NASA Astrophysics Data System (ADS)

Li, C. Y.; Chen, Y.; Wang, B.; Ruan, G. P.; Feng, S. W.; Du, G. H.; Kong, X. L.

2017-06-01

Type-I bursts ( i.e. noise storms) are the earliest-known type of solar radio emission at the meter wavelength. They are believed to be excited by non-thermal energetic electrons accelerated in the corona. The underlying dynamic process and exact emission mechanism still remain unresolved. Here, with a combined analysis of extreme ultraviolet (EUV), radio and photospheric magnetic field data of unprecedented quality recorded during a type-I storm on 30 July 2011, we identify a good correlation between the radio bursts and the co-spatial EUV and magnetic activities. The EUV activities manifest themselves as three major brightening stripes above a region adjacent to a compact sunspot, while the magnetic field there presents multiple moving magnetic features (MMFs) with persistent coalescence or cancelation and a morphologically similar three-part distribution. We find that the type-I intensities are correlated with those of the EUV emissions at various wavelengths with a correlation coefficient of 0.7 - 0.8. In addition, in the region between the brightening EUV stripes and the radio sources there appear consistent dynamic motions with a series of bi-directional flows, suggesting ongoing small-scale reconnection there. Mainly based on the induced connection between the magnetic motion at the photosphere and the EUV and radio activities in the corona, we suggest that the observed type-I noise storms and the EUV brightening activities are the consequence of small-scale magnetic reconnection driven by MMFs. This is in support of the original proposal made by Bentley et al. ( Solar Phys. 193, 227, 2000).

Note: Enhancement of the extreme ultraviolet emission from a potassium plasma by dual laser irradiation

DOE Office of Scientific and Technical Information (OSTI.GOV)

Higashiguchi, Takeshi, E-mail: higashi@cc.utsunomiya-u.ac.jp; Yamaguchi, Mami; Otsuka, Takamitsu

2014-09-15

Emission spectra from multiply charged potassium ions ranging from K{sup 3+} to K{sup 5+} have been obtained in the extreme ultraviolet (EUV) spectral region. A strong emission feature peaking around 38 nm, corresponding to a photon energy of 32.6 eV, is the dominant spectral feature at time-averaged electron temperatures in the range of 8−12 eV. The variation of this emission with laser intensity and the effects of pre-pulses on the relative conversion efficiency (CE) have been explored experimentally and indicate that an enhancement of about 30% in EUV CE is readily attainable.

Effect of the Solar UV/EUV Heating on the Intensity and Spatial Distribution of Jupiter's Synchrotron Radiation

NASA Astrophysics Data System (ADS)

Kita, Hajime; Misawa, H.; Tsuchiya, F.; Tao, C.; Morioka, A.

2012-10-01

Jupiter's synchrotron radiation (JSR) is the emission from relativistic electrons, and it is the most effective probe for remote sensing of Jupiter's radiation belt from the Earth. Recent observations reveal short term variations of JSR with the time scale of days to weeks. Brice and McDonough (1973) proposed that the solar UV/EUV heating for Jupiter's upper atmosphere causes enhancement of total flux density. If such a process occurs at Jupiter, it is also expected that diurnal wind system produces dawn-dusk asymmetry of the JSR brightness distribution. Preceding studies confirmed that the short term variations in total flux density correspond to the solar UV/EUV. However, the effect of solar UV/EUV heating on the brightness distribution has not been confirmed. Hence, the purpose of this study is to confirm the solar UV/EUV heating effect on total flux density and brightness distribution. We made radio imaging analysis using the National Radio Astronomy Observatory (NRAO) archived data of the Very Large Array (VLA) obtained in 2000, and following results were shown. 1, Total flux density varied corresponding to the solar UV/EUV. 2, Dawn side emission was brighter than dusk side emission almost every day. 3, Variations of the dawn-dusk asymmetry did not correspond to the solar UV/EUV. In order to explain the second result, we estimate the diurnal wind velocity from the observed dawn-dusk ratio by using the model brightness distribution of JSR. Estimated neutral wind velocity is 46+/-11 m/s, which reasonably corresponds to the numerical simulation of Jupiter's upper atmosphere. In order to explain the third result, we examined the effect of the global convection electric field driven by tailward outflow of plasma in Jupiter's magnetosphere. As the result, it is suggested that typical fluctuation of the convection electric field strength was enough to cause the observed variations of the dawn-dusk asymmetry.

Magnetic Flux Emergence and the Initiation of Filament Eruptions and CMEs as Observed by the EUV Imaging Telescope on SOHO

NASA Astrophysics Data System (ADS)

Neupert, W. M.

2005-05-01

Solar observations over more than twenty years (e.g., Gaizauskas and Svestka, 1987, summarizing the "Flare Build-up Study", Feynman and Martin, 1995, and more recently, Wang and Sheeley, 1999) have demonstrated that emergence of new magnetic flux in the vicinity of quiescent filament fields frequently leads to the eruption of those filaments, given polarity orientations favorable for magnetic reconnection. Concurrently, models of the interaction of such magnetic flux configurations have been developed to explain the initiation of flares (e.g., Priest and Forbes, 2002) and coronal mass ejections (Chen et al., 2002). We have used observations made in the 195 Angstrom (Fe XII) band by the EUV imaging Telescope (EIT) on SOHO to identify instances of emerging flux, indicated by new EUV emission, and subsequent eruption of a quiescent filament in a search for coronal changes that might appear as a result of merging magnetic fields. Limiting our study to quiescent filaments distant from active regions, we have identified events in which a slow increase in filament height begins shortly (a few hours) after first appearance of an EUV emission source either within or beside the filament channel. For long filaments, the apex of the rising filament appears to lie above the developing EUV source, implying that the field supporting the filament is locally interacting with the emerging field. Transient EUV features at onset of the eruptive phase include low-lying loops over the neutral line and, more rarely, localized sources apparently associated with the rising filament. No evidence of reconfiguring of an overlying corona (only faintly detected by the EIT) prior to CME initiation has been found. Our results support the hypothesis that at least in some instances the emergence of new magnetic field leads to a loss of filament equilibrium and a coronal mass ejection. This work is supported by NASA Intergovernmental Transfer W-10118 to NOAA's Space Environment Center. SOHO is a project of international cooperation between ESA and NASA.

Fluid jet electric discharge source

DOEpatents

Bender, Howard A [Ripon, CA

2006-04-25

A fluid jet or filament source and a pair of coaxial high voltage electrodes, in combination, comprise an electrical discharge system to produce radiation and, in particular, EUV radiation. The fluid jet source is composed of at least two serially connected reservoirs, a first reservoir into which a fluid, that can be either a liquid or a gas, can be fed at some pressure higher than atmospheric and a second reservoir maintained at a lower pressure than the first. The fluid is allowed to expand through an aperture into a high vacuum region between a pair of coaxial electrodes. This second expansion produces a narrow well-directed fluid jet whose size is dependent on the size and configuration of the apertures and the pressure used in the reservoir. At some time during the flow of the fluid filament, a high voltage pulse is applied to the electrodes to excite the fluid to form a plasma which provides the desired radiation; the wavelength of the radiation being determined by the composition of the fluid.

Early evolution of an energetic coronal mass ejection and its relation to EUV waves

DOE Office of Scientific and Technical Information (OSTI.GOV)

Liu, Rui; Wang, Yuming; Shen, Chenglong, E-mail: rliu@ustc.edu.cn

2014-12-10

We study a coronal mass ejection (CME) associated with an X-class flare whose initiation is clearly observed in the low corona with high-cadence, high-resolution EUV images, providing us a rare opportunity to witness the early evolution of an energetic CME in detail. The eruption starts with a slow expansion of cool overlying loops (∼1 MK) following a jet-like event in the periphery of the active region. Underneath the expanding loop system, a reverse S-shaped dimming is seen immediately above the brightening active region in hot EUV passbands. The dimming is associated with a rising diffuse arch (∼6 MK), which wemore » interpret as a preexistent, high-lying flux rope. This is followed by the arising of a double hot channel (∼10 MK) from the core of the active region. The higher structures rise earlier and faster than lower ones, with the leading front undergoing extremely rapid acceleration up to 35 km s{sup –2}. This suggests that the torus instability is the major eruption mechanism and that it is the high-lying flux rope rather than the hot channels that drives the eruption. The compression of coronal plasmas skirting and overlying the expanding loop system, whose aspect ratio h/r increases with time as a result of the rapid upward acceleration, plays a significant role in driving an outward-propagating global EUV wave and a sunward-propagating local EUV wave, respectively.« less

TESIS experiment on EUV imaging spectroscopy of the Sun

NASA Astrophysics Data System (ADS)

Kuzin, S. V.; Bogachev, S. A.; Zhitnik, I. A.; Pertsov, A. A.; Ignatiev, A. P.; Mitrofanov, A. M.; Slemzin, V. A.; Shestov, S. V.; Sukhodrev, N. K.; Bugaenko, O. I.

2009-03-01

TESIS is a set of solar imaging instruments in development by the Lebedev Physical Institute of the Russian Academy of Science, to be launched aboard the Russian spacecraft CORONAS-PHOTON in December 2008. The main goal of TESIS is to provide complex observations of solar active phenomena from the transition region to the inner and outer solar corona with high spatial, spectral and temporal resolution in the EUV and Soft X-ray spectral bands. TESIS includes five unique space instruments: the MgXII Imaging Spectroheliometer (MISH) with spherical bent crystal mirror, for observations of the Sun in the monochromatic MgXII 8.42 Å line; the EUV Spectoheliometer (EUSH) with grazing incidence difraction grating, for the registration of the full solar disc in monochromatic lines of the spectral band 280-330 Å; two Full-disk EUV Telescopes (FET) with multilayer mirrors covering the band 130-136 and 290-320 Å; and the Solar EUV Coronagraph (SEC), based on the Ritchey-Chretien scheme, to observe the inner and outer solar corona from 0.2 to 4 solar radii in spectral band 290-320 Å. TESIS experiment will start at the rising phase of the 24th cycle of solar activity. With the advanced capabilities of its instruments, TESIS will help better understand the physics of solar flares and high-energy phenomena and provide new data on parameters of solar plasma in the temperature range 10-10K. This paper gives a brief description of the experiment, its equipment, and its scientific objectives.

Capillary discharge source

DOEpatents

Bender, III, Howard Albert

2003-11-25

Debris generation from an EUV electric discharge plasma source device can be significantly reduced or essentially eliminated by encasing the electrodes with dielectric or electrically insulating material so that the electrodes are shielded from the plasma, and additionally by providing a path for the radiation to exit wherein the electrodes are not exposed to the area where the radiation is collected. The device includes: (a) a body, which is made of an electrically insulating material, that defines a capillary bore that has a proximal end and a distal end and that defines at least one radiation exit; (b) a first electrode that defines a first channel that has a first inlet end that is connected to a source of gas and a first outlet end that is in communication with the capillary bore, wherein the first electrode is positioned at the distal end of the capillary bore; (c) a second electrode that defines a second channel that has a second inlet end that is in communication with the capillary bore and an outlet end, wherein the second electrode is positioned at the proximal end of the capillary bore; and (d) a source of electric potential that is connected across the first and second electrodes, wherein radiation generated within the capillary bore is emitted through the at least one radiation exit and wherein the first electrode and second electrode are shielded from the emitted radiation.

Exploring EUV and SAQP pattering schemes at 5nm technology node

NASA Astrophysics Data System (ADS)

Hamed Fatehy, Ahmed; Kotb, Rehab; Lafferty, Neal; Jiang, Fan; Word, James

2018-03-01

For years, Moore's law keeps driving the semiconductors industry towards smaller dimensions and higher density chips with more devices. Earlier, the correlation between exposure source's wave length and the smallest resolvable dimension, mandated the usage of Deep Ultra-Violent (DUV) optical lithography system which has been used for decades to sustain Moore's law, especially when immersion lithography was introduced with 193nm ArF laser sources. As dimensions of devices get smaller beyond Deep Ultra-Violent (DUV) optical resolution limits, the need for Extremely Ultra-Violent (EUV) optical lithography systems was a must. However, EUV systems were still under development at that time for the mass-production in semiconductors industry. Theretofore, Multi-Patterning (MP) technologies was introduced to swirl about DUV optical lithography limitations in advanced nodes beyond minimum dimension (CD) of 20nm. MP can be classified into two main categories; the first one is to split the target itself across multiple masks that give the original target patterns when they are printed. This category includes Double, Triple and Quadruple patterning (DP, TP, and QP). The second category is the Self-Aligned Patterning (SAP) where the target is divided into Mandrel patterns and non-Mandrel patterns. The Mandrel patterns get printed first, then a self-aligned sidewalls are grown around these printed patterns drawing the other non-Mandrel targets, afterword, a cut mask(s) is used to define target's line-ends. This approach contains Self-Aligned-Double Pattering (SADP) and Self-Aligned- Quadruple-Pattering (SAQP). DUV and MP along together paved the way for the industry down to 7nm. However, with the start of development at the 5nm node and the readiness of EUV, the differentiation question is aroused again, which pattering approach should be selected, direct printing using EUV or DUV with MP, or a hybrid flow that contains both DUV-MP and EUV. In this work we are comparing two potential pattering techniques for Back End Of Line (BEOL) metal layers in the 5nm technology node, the first technique is Single Exposure EUV (SE-EUV) with a Direct Patterning EUV lithography process, and the second one is Self-Aligned Quadruple Patterning (SAQP) with a hybrid lithography processes, where the drawn metal target layer is decomposed into a Mandrel mask and Blocks/Cut mask, Mandrel mask is printed using DUV 193i lithography process, while Block/Cut Mask is printed using SE-EUV lithography process. The pros and cons of each technique are quantified based on Edge-Placement-Error (EPE) and Process Variation Band (PVBand) measured at 1D and 2D edges. The layout used in this comparison is a candidate layout for Foundries 5nm process node.

Imaging plasmas at the Earth and other planets

NASA Astrophysics Data System (ADS)

Mitchell, D. G.

2006-05-01

The field of space physics, both at Earth and at other planets, was for decades a science based on local observations. By stitching together measurements of plasmas and fields from multiple locations either simultaneously or for similar conditions over time, and by comparing those measurements against models of the physical systems, great progress was made in understanding the physics of Earth and planetary magnetospheres, ionospheres, and their interactions with the solar wind. However, the pictures of the magnetospheres were typically statistical, and the large-scale global models were poorly constrained by observation. This situation changed dramatically with global auroral imaging, which provided snapshots and movies of the effects of field aligned currents and particle precipitation over the entire auroral oval during quiet and disturbed times. And with the advent of global energetic neutral atom (ENA) and extreme ultraviolet (EUV) imaging, global constraints have similarly been added to ring current and plasmaspheric models, respectively. Such global constraints on global models are very useful for validating the physics represented in those models, physics of energy and momentum transport, electric and magnetic field distribution, and magnetosphere-ionosphere coupling. These techniques are also proving valuable at other planets. For example with Hubble Space Telescope imaging of Jupiter and Saturn auroras, and ENA imaging at Jupiter and Saturn, we are gaining new insights into the magnetic fields, gas-plasma interactions, magnetospheric dynamics, and magnetosphere-ionosphere coupling at the giant planets. These techniques, especially ENA and EUV imaging, rely on very recent and evolving technological capabilities. And because ENA and EUV techniques apply to optically thin media, interpretation of their measurements require sophisticated inversion procedures, which are still under development. We will discuss the directions new developments in imaging are taking, what technologies and mission scenarios might best take advantage of them, and how our understanding of the Earth's and other planets' plasma environments may benefit from such advancements.

Plasma upflows and microwave emission in hot supra-arcade structure associated with AN M1.6 limb flare

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kim, S.; Shibasaki, K.; Bain, H.-M.

2014-04-20

We have investigated a supra-arcade structure associated with an M1.6 flare, which occurred on the south-east limb on 2010 November 4. It is observed in EUV with the Atmospheric Imaging Assembly (AIA) on board the Solar Dynamics Observatory, microwaves at 17 and 34 GHz with the Nobeyama Radioheliograph (NoRH), and soft X-rays of 8-20 keV with RHESSI. Interestingly, we found exceptional properties of the supra-arcade thermal plasma from the AIA 131 Å and the NoRH: (1) plasma upflows along large coronal loops and (2) enhancing microwave emission. RHESSI detected two soft X-ray sources, a broad one in the middle ofmore » the supra-arcade structure and a bright one just above the flare-arcade. We estimated the number density and thermal energy for these two source regions during the decay phase of the flare. In the supra-arcade source, we found that there were increases of the thermal energy and the density at the early and last stages, respectively. On the contrary, the density and thermal energy of the source on the top of the flare-arcade decreases throughout. The observed upflows imply that there is continuous energy supply into the supra-arcade structure from below during the decay phase of the flare. It is hard to explain by the standard flare model in which the energy release site is located high in the corona. Thus, we suggest that a potential candidate of the energy source for the hot supra-arcade structure is the flare-arcade, which has exhibited a predominant emission throughout.« less

Sensitivity enhancement of chemically amplified resists and performance study using EUV interference lithography

NASA Astrophysics Data System (ADS)

Buitrago, Elizabeth; Nagahara, Seiji; Yildirim, Oktay; Nakagawa, Hisashi; Tagawa, Seiichi; Meeuwissen, Marieke; Nagai, Tomoki; Naruoka, Takehiko; Verspaget, Coen; Hoefnagels, Rik; Rispens, Gijsbert; Shiraishi, Gosuke; Terashita, Yuichi; Minekawa, Yukie; Yoshihara, Kosuke; Oshima, Akihiro; Vockenhuber, Michaela; Ekinci, Yasin

2016-03-01

Extreme ultraviolet lithography (EUVL, λ = 13.5 nm) is the most promising candidate to manufacture electronic devices for future technology nodes in the semiconductor industry. Nonetheless, EUVL still faces many technological challenges as it moves toward high-volume manufacturing (HVM). A key bottleneck from the tool design and performance point of view has been the development of an efficient, high power EUV light source for high throughput production. Consequently, there has been extensive research on different methodologies to enhance EUV resist sensitivity. Resist performance is measured in terms of its ultimate printing resolution, line width roughness (LWR), sensitivity (S or best energy BE) and exposure latitude (EL). However, there are well-known fundamental trade-off relationships (LRS trade-off) among these parameters for chemically amplified resists (CARs). Here we present early proof-of-principle results for a multi-exposure lithography process that has the potential for high sensitivity enhancement without compromising other important performance characteristics by the use of a Photosensitized Chemically Amplified Resist (PSCAR). With this method, we seek to increase the sensitivity by combining a first EUV pattern exposure with a second UV flood exposure (λ = 365 nm) and the use of a PSCAR. In addition, we have evaluated over 50 different state-of-the-art EUV CARs. Among these, we have identified several promising candidates that simultaneously meet sensitivity, LWR and EL high performance requirements with the aim of resolving line space (L/S) features for the 7 and 5 nm logic node (16 nm and 13 nm half-pitch HP, respectively) for HVM. Several CARs were additionally found to be well resolved down to 12 nm and 11 nm HP with minimal pattern collapse and bridging, a remarkable feat for CARs. Finally, the performance of two negative tone state-of-the-art alternative resist platforms previously investigated was compared to the CAR performance at and below 16 nm HP resolution, demonstrating the need for alternative resist solutions at 13 nm resolution and below. EUV interference lithography (IL) has provided and continues to provide a simple yet powerful platform for academic and industrial research enabling the characterization and development of new resist materials before commercial EUV exposure tools become available. Our experiments have been performed at the EUV-IL set-up in the Swiss Light Source (SLS) synchrotron facility located at the Paul Scherrer Institute (PSI).

ANTI-PARALLEL EUV FLOWS OBSERVED ALONG ACTIVE REGION FILAMENT THREADS WITH HI-C

DOE Office of Scientific and Technical Information (OSTI.GOV)

Alexander, Caroline E.; Walsh, Robert W.; Régnier, Stéphane

Plasma flows within prominences/filaments have been observed for many years and hold valuable clues concerning the mass and energy balance within these structures. Previous observations of these flows primarily come from Hα and cool extreme-ultraviolet (EUV) lines (e.g., 304 Å) where estimates of the size of the prominence threads has been limited by the resolution of the available instrumentation. Evidence of 'counter-steaming' flows has previously been inferred from these cool plasma observations, but now, for the first time, these flows have been directly imaged along fundamental filament threads within the million degree corona (at 193 Å). In this work, wemore » present observations of an AR filament observed with the High-resolution Coronal Imager (Hi-C) that exhibits anti-parallel flows along adjacent filament threads. Complementary data from the Solar Dynamics Observatory (SDO)/Atmospheric Imaging Assembly (AIA) and Helioseismic and Magnetic Imager are presented. The ultra-high spatial and temporal resolution of Hi-C allow the anti-parallel flow velocities to be measured (70-80 km s{sup –1}) and gives an indication of the resolvable thickness of the individual strands (0.''8 ± 0.''1). The temperature of the plasma flows was estimated to be log T (K) = 5.45 ± 0.10 using Emission Measure loci analysis. We find that SDO/AIA cannot clearly observe these anti-parallel flows or measure their velocity or thread width due to its larger pixel size. We suggest that anti-parallel/counter-streaming flows are likely commonplace within all filaments and are currently not observed in EUV due to current instrument spatial resolution.« less

Unbiased roughness measurements: the key to better etch performance

NASA Astrophysics Data System (ADS)

Liang, Andrew; Mack, Chris; Sirard, Stephen; Liang, Chen-wei; Yang, Liu; Jiang, Justin; Shamma, Nader; Wise, Rich; Yu, Jengyi; Hymes, Diane

2018-03-01

Edge placement error (EPE) has become an increasingly critical metric to enable Moore's Law scaling. Stochastic variations, as characterized for lines by line width roughness (LWR) and line edge roughness (LER), are dominant factors in EPE and known to increase with the introduction of EUV lithography. However, despite recommendations from ITRS, NIST, and SEMI standards, the industry has not agreed upon a methodology to quantify these properties. Thus, differing methodologies applied to the same image often result in different roughness measurements and conclusions. To standardize LWR and LER measurements, Fractilia has developed an unbiased measurement that uses a raw unfiltered line scan to subtract out image noise and distortions. By using Fractilia's inverse linescan model (FILM) to guide development, we will highlight the key influences of roughness metrology on plasma-based resist smoothing processes. Test wafers were deposited to represent a 5 nm node EUV logic stack. The patterning stack consists of a core Si target layer with spin-on carbon (SOC) as the hardmask and spin-on glass (SOG) as the cap. Next, these wafers were exposed through an ASML NXE 3350B EUV scanner with an advanced chemically amplified resist (CAR). Afterwards, these wafers were etched through a variety of plasma-based resist smoothing techniques using a Lam Kiyo conductor etch system. Dense line and space patterns on the etched samples were imaged through advanced Hitachi CDSEMs and the LER and LWR were measured through both Fractilia and an industry standard roughness measurement software. By employing Fractilia to guide plasma-based etch development, we demonstrate that Fractilia produces accurate roughness measurements on resist in contrast to an industry standard measurement software. These results highlight the importance of subtracting out SEM image noise to obtain quicker developmental cycle times and lower target layer roughness.

Origin and Ion Charge State Evolution of Solar Wind Transients during 4 - 7 August 2011

NASA Astrophysics Data System (ADS)

Rodkin, D.; Goryaev, F.; Pagano, P.; Gibb, G.; Slemzin, V.; Shugay, Y.; Veselovsky, I.; Mackay, D. H.

2017-07-01

We present a study of the complex event consisting of several solar wind transients detected by the Advanced Composition Explorer (ACE) on 4 - 7 August 2011, which caused a geomagnetic storm with Dst=-110 nT. The supposed coronal sources, three flares and coronal mass ejections (CMEs), occurred on 2 - 4 August 2011 in active region (AR) 11261. To investigate the solar origin and formation of these transients, we study the kinematic and thermodynamic properties of the expanding coronal structures using the Solar Dynamics Observatory/Atmospheric Imaging Assembly (SDO/AIA) EUV images and differential emission measure (DEM) diagnostics. The Helioseismic and Magnetic Imager (HMI) magnetic field maps were used as the input data for the 3D magnetohydrodynamic (MHD) model to describe the flux rope ejection (Pagano, Mackay, and Poedts, 2013b). We characterize the early phase of the flux rope ejection in the corona, where the usual three-component CME structure formed. The flux rope was ejected with a speed of about 200 km s^{-1} to the height of 0.25 R_{⊙}. The kinematics of the modeled CME front agrees well with the Solar Terrestrial Relations Observatory (STEREO) EUV measurements. Using the results of the plasma diagnostics and MHD modeling, we calculate the ion charge ratios of carbon and oxygen as well as the mean charge state of iron ions of the 2 August 2011 CME, taking into account the processes of heating, cooling, expansion, ionization, and recombination of the moving plasma in the corona up to the frozen-in region. We estimate a probable heating rate of the CME plasma in the low corona by matching the calculated ion composition parameters of the CME with those measured in situ for the solar wind transients. We also consider the similarities and discrepancies between the results of the MHD simulation and the observations.

Novel EUV mask black border and its impact on wafer imaging

NASA Astrophysics Data System (ADS)

Kodera, Yutaka; Fukugami, Norihito; Komizo, Toru; Watanabe, Genta; Ito, Shin; Yoshida, Itaru; Maruyama, Shingo; Kotani, Jun; Konishi, Toshio; Haraguchi, Takashi

2016-03-01

EUV lithography is the most promising technology for semiconductor device manufacturing of the 10nm node and beyond. The EUV mask is a key element in the lithographic scanner optical path. The image border is a pattern free dark area around the die on the photomask serving as transition area between the parts of the mask that is shielded from the exposure light by the Reticle Masking (REMA) blades and the die. When printing a die at dense spacing on an EUV scanner, the EUV light reflection from the image border overlaps edges of neighboring dies, affecting CD and contrast in this area. To reduce this effect an etched multilayer type black border was developed, and it was demonstrated that CD impact at the edge of a die is strongly reduced with this type of the black border (BB). However, wafer printing result still showed some CD change influenced by the black border reflection. It was proven that the CD shift was caused by DUV Out of Band (OOB) light which is emitted from EUV light source. New types of a multilayer etched BB were evaluated and showed a good potential for DUV light suppression. In this study, a novel black border called Hybrid Black Border has been developed which allows to eliminate EUV and DUV OOB light reflection. Direct measurements of OOB light from HBB and Normal BB are performed on NXE:3300B ASML EUV scanner; it is shown that HBB OOB reflection is 3x lower than that of Normal BB. Finally, we state that HBB is a promising technology allowing for CD control at die edges.

Controlling contamination in Mo/Si multilayer mirrors by Si surface capping modifications

NASA Astrophysics Data System (ADS)

Malinowski, Michael E.; Steinhaus, Chip; Clift, W. Miles; Klebanoff, Leonard E.; Mrowka, Stanley; Soufli, Regina

2002-07-01

The performance of Mo/Si multilayer mirrors (MLMs) used to reflect UV (EUV) radiation in an EUV + hydrocarbon (NC) vapor environment can be improved by optimizing the silicon capping layer thickness on the MLM in order to minimize the initial buildup of carbon on MLMs. Carbon buildup is undesirable since it can absorb EUV radiation and reduce MLM reflectivity. A set of Mo/Si MLMs deposited on Si wafers was fabricated such that each MLM had a different Si capping layer thickness ranging form 2 nm to 7 nm. Samples from each MLM wafer were exposed to a combination of EUV light + (HC) vapors at the Advanced Light Source (ALS) synchrotron in order to determine if the Si capping layer thickness affected the carbon buildup on the MLMs. It was found that the capping layer thickness had a major influence on this 'carbonizing' tendency, with the 3 nm layer thickness providing the best initial resistance to carbonizing and accompanying EUV reflectivity loss in the MLM. The Si capping layer thickness deposited on a typical EUV optic is 4.3 nm. Measurements of the absolute reflectivities performed on the Calibration and Standards beamline at the ALS indicated the EUV reflectivity of the 3 nm-capped MLM was actually slightly higher than that of the normal, 4 nm Si-capped sample. These results show that he use of a 3 nm capping layer represents an improvement over the 4 nm layer since the 3 nm has both a higher absolute reflectivity and better initial resistance to carbon buildup. The results also support the general concept of minimizing the electric field intensity at the MLM surface to minimize photoelectron production and, correspondingly, carbon buildup in a EUV + HC vapor environment.

Multilayer deposition and EUV reflectance characterization of 131 ? flight mirrors for AIA at LLNL

DOE Office of Scientific and Technical Information (OSTI.GOV)

Soufli, R; Robinson, J C; Spiller, E

2006-02-22

Mo/Si multilayer coatings reflecting at 131 {angstrom} were deposited successfully on the AIA primary and secondary flight mirrors and on two coating witness Si wafers, on November 16, 2005, at LLNL. All coatings were characterized by means of EUV reflectance measurements at beamline 6.3.2 of the Advanced Light Source (ALS) synchrotron at LBNL, and were found to be well within specifications.

A study of acoustic heating and forced convection in the solar corona

NASA Technical Reports Server (NTRS)

Foukal, P. V.

1980-01-01

The S055 EUV spectra was used to perform emission measure and line intensity ratio analyses of loop plasma conditions in a study on the thermodynamics of magnetic loops in the solar corona. The evidence that loops contain plasma hotter than the background corona, and thus, require enhanced local dissipation of magnetic or mechanical energy is discussed. The S055 EUV raster pictures were used to study physical conditions in cool ultraviolet absorbing clouds in the solar corona, and optical data were used to derive constraints on the dimension, time scales and optical depths in dark opaque clouds not seen in H alpha and CaK as filaments or prominences. Theoretical modelling of propagation of magnetically guided acoustic shocks in the solar chromosphere finds it still unlikely that high frequency acoustic shocks could reach the solar corona. Dynamic modelling of spicules shows that such guided slow mode shocks can explain the acceleration of cool spicular material seen high in the corona.

A study of tungsten spectra using large helical device and compact electron beam ion trap in NIFS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Morita, S.; Goto, M.; Murakami, I.

2013-07-11

Tungsten spectra have been observed from Large Helical Device (LHD) and Compact electron Beam Ion Trap (CoBIT) in wavelength ranges of visible to EUV. The EUV spectra with unresolved transition array (UTA), e.g., 6g-4f, 5g-4f, 5f-4d and 5p-4d transitions for W{sup +24-+33}, measured from LHD plasmas are compared with those measured from CoBIT with monoenergetic electron beam ({<=}2keV). The tungsten spectra from LHD are well analyzed based on the knowledge from CoBIT tungsten spectra. The C-R model code has been developed to explain the UTA spectra in details. Radial profiles of EUV spectra from highly ionized tungsten ions have beenmore » measured and analyzed by impurity transport simulation code with ADPAK atomic database code to examine the ionization balance determined by ionization and recombination rate coefficients. As the first trial, analysis of the tungsten density in LHD plasmas is attempted from radial profile of Zn-like WXLV (W{sup 44+}) 4p-4s transition at 60.9A based on the emission rate coefficient calculated with HULLAC code. As a result, a total tungsten ion density of 3.5 Multiplication-Sign 10{sup 10}cm{sup -3} at the plasma center is reasonably obtained. In order to observe the spectra from tungsten ions in lower-ionized charge stages, which can give useful information on the tungsten influx in fusion plasmas, the ablation cloud of the impurity pellet is directly measured with visible spectroscopy. A lot of spectra from neutral and singly ionized tungsten are observed and some of them are identified. A magnetic forbidden line from highly ionized tungsten ions has been examined and Cd-like WXXVII (W{sup 26+}) at 3893.7A is identified as the ground-term fine-structure transition of 4f{sup 23}H{sub 5}-{sup 3}H{sub 4}. The possibility of {alpha} particle diagnostic in D-T burning plasmas using the magnetic forbidden line is discussed.« less

The pressure and energy balance of the cool corona over sunspots

NASA Technical Reports Server (NTRS)

Foukal, P. V.

1976-01-01

The 22 largest sunspots observed with the Skylab SO55 spectrometer are studied for a relation between their EUV radiation and their umbral size or magnetic classification. The ultimate goal is to determine why the coronal plasma is so cool over a sunspot and how this cool plasma manages to support itself against gravity. Based on the time behavior of the EUV emission, a steady-state model is developed for the pressure and energy balance of the cool coronal-plasma loops over the spots. Analysis of the temperature structure in a typical loop indicates that the loop is exceedingly well insulated from the outside corona, that its energy balance is determined purely by internal heating and cooling processes, and that a heat input of about 0.0001 erg/cu cm per sec is required along the full length of the loop. It is proposed that: (1) coronal material flows steadily across the field lines at the tops of the loops and falls downward along both sides under gravity; (2) the corona is heated by mechanical-energy transport across the very thin transition region immediately over network-cell interiors; and (3) strong magnetic fields tend to inhibit mechanical-energy dissipation in the corona.

Extreme Ultraviolet Spectra of Few-Times Ionized Tungsten for Divertor Plasma Diagnostics

DOE PAGES

Clementson, Joel; Lennartsson, Thomas; Beiersdorfer, Peter

2015-09-09

The extreme ultraviolet (EUV) emission from few-times ionized tungsten atoms has been experimentally studied at the Livermore electron beam ion trap facility. The ions were produced and confined during low-energy operations of the EBIT-I electron beam ion trap. By varying the electron-beam energy from around 30–300 eV, tungsten ions in charge states expected to be abundant in tokamak divertor plasmas were excited, and the resulting EUV emission was studied using a survey spectrometer covering 120–320 Å. It is found that the emission strongly depends on the excitation energy; below 150 eV, it is relatively simple, consisting of strong isolated linesmore » from a few charge states, whereas at higher energies, it becomes very complex. For divertor plasmas with tungsten impurity ions, this emission should prove useful for diagnostics of tungsten flux rates and charge balance, as well as for radiative cooling of the divertor volume. Several lines in the 194–223 Å interval belonging to the spectra of five- and seven-times ionized tungsten (Tm-like W VI and Ho-like W VIII) were also measured using a high-resolution spectrometer.« less

High-Resolution EUV Spectroscopy of White Dwarfs

NASA Astrophysics Data System (ADS)

Kowalski, Michael P.; Wood, K. S.; Barstow, M. A.

2014-01-01

We compare results of high-resolution EUV spectroscopic measurements of the isolated white dwarf G191-B2B and the binary system Feige 24 obtained with the J-PEX (Joint Plasmadynamic Experiment), which was sponsored jointly by the U.S. Naval Research Laboratory and NASA. J-PEX delivers the world's highest resolution in EUV and does so at high effective area (e.g., more effective area in a sounding rocket than is available with Chandra at adjacent energies, but in a waveband Chandra cannot reach). The capability J-PEX represents is applicable to the astrophysics of hot plasmas in stellar coronae, white dwarfs and the ISM. G191-B2B and Feige 24 are quite distinct hot white dwarf systems having in common that they are bright in the portion of the EUV where He emission features and edges occur, hence they can be exploited to probe both the stellar atmosphere and the ISM, separating those components by model-fitting that sums over all relevant (He) spectral features in the band. There is evidence from these fits that atmospheric He is being detected but the result is more conservatively cast as a pair of upper limits. We discuss how longer duration satellite observations with the same instrumentation could increase exposure to detect atmospheric He in these and other nearby hot white dwarfs.

Ion Traps at the Sun: Implications for Elemental Fractionation

NASA Astrophysics Data System (ADS)

Fleishman, Gregory D.; Musset, Sophie; Bommier, Véronique; Glesener, Lindsay

2018-04-01

Why the tenuous solar outer atmosphere, or corona, is much hotter than the underlying layers remains one of the greatest challenges for solar modeling. Detailed diagnostics of the coronal thermal structure come from extreme ultraviolet (EUV) emission. The EUV emission is produced by heavy ions in various ionization states and depends on the amount of these ions and on plasma temperature and density. Any nonuniformity of the elemental distribution in space or variability in time affects thermal diagnostics of the corona. Here we theoretically predict ionized chemical element concentrations in some areas of the solar atmosphere, where the electric current is directed upward. We then detect these areas observationally, by comparing the electric current density with the EUV brightness in an active region. We found a significant excess in EUV brightness in the areas with positive current density rather than negative. Therefore, we report the observational discovery of substantial concentrations of heavy ions in current-carrying magnetic flux tubes, which might have important implications for the elemental fractionation in the solar corona known as the first ionization potential effect. We call such areas of heavy ion concentration the “ion traps.” These traps hold enhanced ion levels until they are disrupted by a flare, whether large or small.

On the energy crisis in the Io plasma torus

NASA Technical Reports Server (NTRS)

Smith, Robert A.; Bagenal, Fran; Cheng, Andrew F.; Strobel, Darrell

1988-01-01

Recent calculations of the energy balance of the Io plasma torus show that the observed UV and EUV radiation cannot be maintained solely via energy input by the ion pickup mechanism. Current theoretical models of the torus must be modified to include non-local energy input. It is argued that the required energy may be supplied by inward diffusion of energetic heavy ions with energies less than about 20 keV.

Does UV CETI Suffer from the MAD Syndrome?

NASA Technical Reports Server (NTRS)

Drake, Jeremy

2000-01-01

Data have been reduced and partially analyzed and models have been fitted. ASCA data indicate a metal-poor corona, with metals down by a factor of 3 or more relative to the photospheric values. EUVE data show a FIP effect, which is expected if the metals are enhanced rather than depleted. An absolute measure of the metal abundance has not yet been performed for the EUVE data. Either the FIP effect is in operation in the presence of a global depletion of metals, or the ASCA analysis is giving the wrong answer. The latter could be the case if the plasma models applied are incomplete. Further investigation into this is warranted prior to publication.

Effects of Solar Irradiance on Ion Fluxes at Mars. MARS EXPRESS and MAVEN Observations

NASA Astrophysics Data System (ADS)

Dubinin, E.; Fraenz, M.; McFadden, J. P.; Eparvier, F. G.; Brain, D. A.; Jakosky, B. M.; Andrews, D. J.; Barbash, S.

2016-12-01

Recent observations by Mars Express and MAVEN spacecraft have shown that the Martian atmosphere/ionosphere is exposed to the impact of solar wind which results in losses of volatiles from Mars. This erosion is an important factor for the evolution of the Martian atmosphere and its water inventory. To estimate the escape forced by the solar wind during the early Solar system conditions we need to know how the ionosphere of Mars and escape fluxes depend on variations in the strength of the external drivers, in particularly, of solar wind and solar EUV flux. We present multi-instrument observations of the influence of the solar irradiance on the Martian ionosphere and escape fluxes. We use data obtained by the ASPERA-3 and MARSIS experiments on Mars Express and by the STATIC instrument and EUV monitor on MAVEN. Observations by Mars Express supplemented by the EUV monitoring at Earth orbit and translated to Mars orbit provide us information about this dependence over more than 10 years whereas the measurements made by MAVEN provide us for the first time the opportunity to study these processes with simultaneous monitoring of the ionospheric variations, planetary ion fluxes and solar irradiance. We can show that fluxes of planetary ions through different escape channels (trans-terminator fluxes, ion plume, plasma sheet) respond differently on the EUV variations. The most significant effect on the ion scavenging with increase of the solar irradiance is observed for low energy ions extracted from the ionosphere while the ion fluxes in the plume are almost insensitive to the EUV variations.

Production of EUV mask blanks with low killer defects

NASA Astrophysics Data System (ADS)

Antohe, Alin O.; Kearney, Patrick; Godwin, Milton; He, Long; John Kadaksham, Arun; Goodwin, Frank; Weaver, Al; Hayes, Alan; Trigg, Steve

2014-04-01

For full commercialization, extreme ultraviolet lithography (EUVL) technology requires the availability of EUV mask blanks that are free of defects. This remains one of the main impediments to the implementation of EUV at the 22 nm node and beyond. Consensus is building that a few small defects can be mitigated during mask patterning, but defects over 100 nm (SiO2 equivalent) in size are considered potential "killer" defects or defects large enough that the mask blank would not be usable. The current defect performance of the ion beam sputter deposition (IBD) tool will be discussed and the progress achieved to date in the reduction of large size defects will be summarized, including a description of the main sources of defects and their composition.

Embedded top-coat for reducing the effect out of band radiation in EUV lithography

NASA Astrophysics Data System (ADS)

Du, Ke; Siauw, Meiliana; Valade, David; Jasieniak, Marek; Voelcker, Nico; Trefonas, Peter; Thackeray, Jim; Blakey, Idriss; Whittaker, Andrew

2017-03-01

Out of band (OOB) radiation from the EUV source has significant implications for the performance of EUVL photoresists. Here we introduce a surface-active polymer additive, capable of partitioning to the top of the resist film during casting and annealing, to protect the underlying photoresist from OOB radiation. Copolymers were prepared using reversible addition-fragmentation chain transfer (RAFT) polymerization, and rendered surface active by chain extension with a block of fluoro-monomer. Films were prepared from the EUV resist with added surface-active Embedded Barrier Layer (EBL), and characterized using measurements of contact angles and spectroscopic ellipsometry. Finally, the lithographic performance of the resist containing the EBL was evaluated using Electron Beam Lithography exposure

Measurement And Modeling Of Fe VIII To Fe XVI M-shell Emission In The Extreme Ultraviolet

NASA Astrophysics Data System (ADS)

Beiersdorfer, Peter; Lepson, J. K.; Hurwitz, M.

2007-05-01

The solar EUV emission near 200 Å is presently being studied with high resolution with the Cosmic Hot Interstellar Plasma Spectrometer (CHIPS), which focuses on the emission between 90 and 270 Å, and with the EUV Imaging Spectrometer on Hinode, which focuses on the region 180 to 204 Å and 250 to 290 Å. The Solar EUV Experiment on the TIMED spacecraft also observes this spectral band but with greatly reduced resolution. The spectrum in this region is dominated by emission from moderate charge states of iron. The interpretation of the data relies on accurate and complete plasma emission models, notably CHIANTI. We have performed a series of laboratory measurements of the 3-3 emission from M-shell iron ions. The measurements cover the range 170 - 250 Å and are made at an electron density of about 1011 cm-3. Emission from Fe VIII through Fe XVI has been identified. Excellent agreement with CHIANTI predictions is found. A few weak transitions are noted in the laboratory data that are predicted by CHIANTI to be vanishingly small and should not have been observed. These are tentatively attributed to transitions in Fe XV. A comparison with observations from CHIPS is also presented. This work was supported in part by NASA's Solar and Heliospheric Physics Supporting Research and Technology Program. Work at UC-LLNL was performed under the auspices of the DOE by under Contract W-7405-Eng-48.

Depressed emission between magnetic arcades near a sunspot

NASA Astrophysics Data System (ADS)

Ryabov, B. I.; Shibasaki, K.

The locations of the depressed emission in microwaves, EUV and soft X-rays are compared with each other and with the location of the plasma outflow in the active region (AR) 8535 on the Sun. We found that two open-field regions overlap the regions of depressed emission near the AR's sunspot. These two open-field regions are simulated with the potential-field source-surface (PFSS) model under radial distances of RSS = 1.8 R⊙ and RSS = 2.5 R⊙. Each open-field region is located between the arcades of the loops of the same magnetic polarity. The former open-field region covers the region of the plasma outflow, which is thus useful for the tests on connection to the heliosphere. The utmost microwave depression of the intensity in the ordinary mode (the Very Large Array 15 GHz observations) also overlaps the region of the plasma outflow and thus indicates this outflow. The lasting for eight days depression in soft X-rays and the SOHO EIT 2.84× 10-8 m images are attributed to the evacuation of as hot coronal plasma as T≥ 2× 106 K from the extended in height (``open") magnetic structures. We conclude that the AR 8535 presents the sunspot atmosphere affected by the large-scale magnetic fields.

Laboratory Data for X-Ray Astronomy

NASA Technical Reports Server (NTRS)

Beiersdorfer, P.; Brown, G. V.; Chen, H.; Gu, M.-F.; Kahn, S. M.; Lepson, J. K.; Savin, D. W.; Utter, S. B.

2000-01-01

Laboratory facilities have made great strides in producing large sets of reliable data for X-ray astronomy, which include ionization and recombination cross sections needed for charge balance calculations as well as the atomic data needed for interpreting X-ray line formation. We discuss data from the new generation sources and pay special attention to the LLNL electron beam ion trap experiment, which is unique in its ability to provide direct laboratory access to spectral data under precisely controlled conditions that simulate those found in many astrophysical plasmas. Examples of spectral data obtained in the 1-160 A wavelength range are given illustrating the type of laboratory X-ray data produced in support of such missions as Chandra, X-Ray Multi-Mirror telescope (XMM), Advanced Satellite for Cosmology and Astrophysics (ASCA) and Extreme Ultraviolet Explorer Satellite (EUVE).

Expected scientific performance of the three spectrometers on the extreme ultraviolet explorer

NASA Technical Reports Server (NTRS)

Vallerga, J. V.; Jelinsky, P.; Vedder, P. W.; Malina, R. F.

1990-01-01

The expected in-orbit performance of the three spectrometers included on the Extreme Ultraviolet Explorer astronomical satellite is presented. Recent calibrations of the gratings, mirrors and detectors using monochromatic and continuum EUV light sources allow the calculation of the spectral resolution and throughput of the instrument. An effective area range of 0.2 to 2.8 sq cm is achieved over the wavelength range 70-600 A with a peak spectral resolution (FWHM) of 360 assuming a spacecraft pointing knowledge of 10 arc seconds (FWHM). For a 40,000 sec observation, the average 3 sigma sensitivity to a monochromatic line source is 0.003 photons/sq cm s. Simulated observations of known classes of EUV sources, such as hot white dwarfs, and cataclysmic variables are also presented.

Using SDO's AIA to investigate energy transport from a flare's energy release site to the chromosphere

NASA Astrophysics Data System (ADS)

Brosius, J. W.; Holman, G. D.

2012-04-01

Context. Coordinated observations of a GOES B4.8 microflare with SDO's Atmospheric Imaging Assembly (AIA) and the Ramaty High Energy Solar Spectroscopic Imager (RHESSI) on 2010 July 31 show that emission in all seven of AIA's EUV channels brightened simultaneously nearly 6 min before RHESSI or GOES detected emission from plasma at temperatures around 10 MK. Aims: To help interpret these and AIA flare observations in general, we characterized the expected temporal responses of AIA's 94, 131, 171, 193, 211, and 335 Å channels to solar flare brightenings by combining (1) AIA's nominal temperature response functions available through SSWIDL with (2) EUV spectral line data observed in a flare loop footpoint on 2001 April 24 with the Coronal Diagnostic Spectrometer (CDS) on timescales comparable to AIA's image cadence. Methods: The nine emission lines observed by CDS cover a wide range of formation temperature from about 0.05 to 8 MK. Line brightenings observed early during the CDS flare occurred at temperatures less than about 0.7 MK, with the largest values around 0.1 MK. These brightenings were consistent with the flare's energy transport being dominated by nonthermal particle beams. Because all of AIA's EUV channels are sensitive to emission from plasma in the 0.1 to 0.7 MK temperature range, we show that all of AIA's EUV channels will brighten simultaneously during flares like this, in which energy transport is dominated by nonthermal particle beams. Results: The 2010 July 31 flare observed by AIA and RHESSI displays this behavior, so we conclude that such beams likely dominated the flare's energy transport early during the event. When thermal conduction from a reconnection-heated, hot (~10 MK) plasma dominates the energy transport, the AIA channels that are sensitive to emission from such temperatures (particularly the 94 and 131 Å channels) will brighten earlier than the channels that are not sensitive to such temperatures (171 and 211 Å). Conclusions: Thus, based on the differences expected between AIA's response to flares whose energy transport is dominated by nonthermal particle beams from those whose energy transport is dominated by thermal conduction, AIA can be used to determine the dominant energy transport mechanism for any given event. Movie is available in electronic form at http://www.aanda.org

Ultraviolet out-of-band radiation studies in laser tin plasma sources

NASA Astrophysics Data System (ADS)

Parchamy, Homaira; Szilagyi, John; Masnavi, Majid; Richardson, Martin

2017-11-01

Out-of-band long wavelength emission measurements from high power, high-repetition-rate extreme-ultra-violet lithography (EUVL) laser plasma sources are imperative to estimating heat deposition in EUV mirrors, and the impact of short wavelength light transported through the imaging system to the wafer surface. This paper reports a series of experiments conducted to measure the absolute spectral irradiances of laser-plasmas produced from planar tin targets over the wavelength region of 124 to 164 nm by 1.06 μm wavelength, 10 ns full-width-at-half-maximum Gaussian laser pulses. The use of spherical targets is relevant to the EUVL source scenario. Although plasmas produced from planar surfaces evolve differently, there is a close similarity to the evolution of current from 10.6 μm CO2 laser EUVL sources, which use a pre-pulse from a lower energy solid-state laser to melt and reform an initial spherical droplet into a thin planar disc target. The maximum of radiation conversion efficiency in the 124-164 nm wavelength band (1%/2πsr) occurs at the laser intensity of 1010 W cm-2. A developed collisional-radiative model reveals the strong experimental spectra that originate mainly from the 4d105p2-4d105s5p, 4d105p-4d105s resonance lines, and 4d95p-4d95s unresolved transition arrays from Sn III, Sn IV, and Sn V ions, respectively. The calculated conversion efficiencies using a 2D radiation-hydrodynamics model are in agreement with the measurements. The model predicts the out-of-band (100-400 nm) radiation conversion efficiencies generated by both 1.06 and 10.6 μm pulses. The 10.6 μm laser pulse produces a higher conversion efficiency (12%/2πsr) at the lower laser intensity of 109 W cm-2.

Identification of coronal sources of the solar wind from solar images in the EUV spectral range

NASA Astrophysics Data System (ADS)

Slemzin, V. A.; Shugai, Yu. S.

2015-01-01

Methods of localizing coronal sources of the solar wind (SW), such as coronal holes, quasi-stationary fluxes from active regions, and transient sources associated with small-scale active phenomena are considered based on vacuum-ultraviolet (EUV) images of the corona at low solar activity during the initial period of the 24th solar cycle (2010). It is shown that a SW velocity profile can be calculated from the relative areas of coronal holes (CH) at the central part of the disk based on the images in the ranges of 193 and 171 Å. The images in the 193 Å describe the geometry of large HCs that represent sources of fast SW well. The images in 171 Å are a better visualization of small CHs, based on which the profile of a slow SW component was calculated to a high accuracy (up to 65 km/s). According to Hinode/EIS data of October 15, 2010, using the Doppler spectroscopy method at the streamer base over the active region 11112, the source of the outgoing plasma flux with the mean velocity of 17 km/s was localized in the magnetic field region with an intensity of less than 200 Gauss. According to the estimate, the density of the plasma flux from this source is an order of magnitude greater than the value required for explaining the distinction between the calculated and measured profiles of a slow SW velocity. For finding the transient SW component based on small-scale flare activity, SW parameters were analyzed for the periods of flares accompanied by coronal mass ejections (CMEs), and for the periods without flares, according to the data obtained in 2010 from the ACE and GOES satellites and by coronagraphs on the STEREO-A and - B spacecraft. The ion ratios C+6/C+5 and O+7/O+6 and the mean charge of Fe ions for periods with flares were shown to be shifted toward large values, suggesting the presence of a hot SW component associated with flare activity. A noticeable correlation between the maximum charge of Fe ions and the peak power of a flare, previously observed for flares of a higher class, was confirmed. The mean value of the SW flux density during the periods of flares was 30% higher than that in the periods without flares, which is possibly associated also with the growth of fluxes from other sources with an increasing solar activity level. Based on the example of a series of flares of October 13-14, 2010, it was supposed that transient SW fluxes from the weak flares at low solar activity can manifest themselves in the form of interplanetary ICME-transients.

Active galaxies observed during the Extreme Ultraviolet Explorer all-sky survey

NASA Technical Reports Server (NTRS)

Marshall, H. L.; Fruscione, A.; Carone, T. E.

1995-01-01

We present observations of active galactic nuclei (AGNs) obtained with the Extreme Ultraviolet Explorer (EUVE) during the all-sky survey. A total of 13 sources were detected at a significance of 2.5 sigma or better: seven Seyfert galaxies, five BL Lac objects, and one quasar. The fraction of BL Lac objects is higher in our sample than in hard X-ray surveys but is consistent with the soft X-ray Einstein Slew Survey, indicating that the main reason for the large number of BL Lac objects in the extreme ulktraviolet (EUV) and soft X-ray bands is their steeper X-ray spectra. We show that the number of AGNs observed in both the EUVE and ROSAT Wide Field Camera surveys can readily be explained by modelling the EUV spectra with a simple power law in the case of BL Lac objects and with an additional EUV excess in the case of Seyferts and quasars. Allowing for cold matter absorption in Seyfert galaxy hosts drive up the inferred average continuum slope to 2.0 +/- 0.5 (at 90% confidence), compared to a slope of 1.0 usually found from soft X-ray data. If Seyfert galaxies without EUV excesses form a significant fraction of the population, then the average spectrum of those with bumps should be even steeper. We place a conservative limit on neutral gas in BL Lac objects: N(sub H) less than 10(exp 20)/sq cm.

Method for extreme ultraviolet lithography

DOEpatents

Felter, T. E.; Kubiak, Glenn D.

1999-01-01

A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

Method for extreme ultraviolet lithography

DOEpatents

Felter, T. E.; Kubiak, G. D.

2000-01-01

A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

Catastrophic cooling and cessation of heating in the solar corona

NASA Astrophysics Data System (ADS)

Peter, H.; Bingert, S.; Kamio, S.

2012-01-01

Context. Condensations in the more than 106 K hot corona of the Sun are commonly observed in the extreme ultraviolet (EUV). While their contribution to the total solar EUV radiation is still a matter of debate, these condensations certainly provide a valuable tool for studying the dynamic response of the corona to the heating processes. Aims: We investigate different distributions of energy input in time and space to investigate which process is most relevant for understanding these coronal condensations. Methods: For a comparison to observations we synthesize EUV emission from a time-dependent, one-dimensional model for coronal loops, where we employ two heating scenarios: simply shutting down the heating and a model where the heating is very concentrated at the loop footpoints, while keeping the total heat input constant. Results: The heating off/on model does not lead to significant EUV count rates that one observes with SDO/AIA. In contrast, the concentration of the heating near the footpoints leads to thermal non-equilibrium near the loop top resulting in the well-known catastrophic cooling. This process gives a good match to observations of coronal condensations. Conclusions: This shows that the corona needs a steady supply of energy to support the coronal plasma, even during coronal condensations. Otherwise the corona would drain very fast, too fast to even form a condensation. Movies are available in electronic form at http://www.aanda.org

SEMATECH EUVL mask program status

NASA Astrophysics Data System (ADS)

Yun, Henry; Goodwin, Frank; Huh, Sungmin; Orvek, Kevin; Cha, Brian; Rastegar, Abbas; Kearney, Patrick

2009-04-01

As we approach the 22nm half-pitch (hp) technology node, the industry is rapidly running out of patterning options. Of the several lithography techniques highlighted in the International Technology Roadmap for Semiconductors (ITRS), the leading contender for the 22nm hp insertion is extreme ultraviolet lithography (EUVL). Despite recent advances with EUV resist and improvements in source power, achieving defect free EUV mask blank and enabling the EUV mask infrastructure still remain critical issues. To meet the desired EUV high volume manufacturing (HVM) insertion target date of 2013, these obstacles must be resolved on a timely bases. Many of the EUV mask related challenges remain in the pre-competitive stage and a collaborative industry based consortia, such as SEMATECH can play an important role to enable the EUVL landscape. SEMATECH based in Albany, NY is an international consortium representing several of the largest manufacturers in the semiconductor market. Full members include Intel, Samsung, AMD, IBM, Panasonic, HP, TI, UMC, CNSE (College of Nanoscience and Engineering), and Fuller Road Management. Within the SEMATECH lithography division a major thrust is centered on enabling the EUVL ecosystem from mask development, EUV resist development and addressing EUV manufacturability concerns. An important area of focus for the SEMATECH mask program has been the Mask Blank Development Center (MBDC). At the MBDC key issues in EUV blank development such as defect reduction and inspection capabilities are actively pursued together with research partners, key suppliers and member companies. In addition the mask program continues a successful track record of working with the mask community to manage and fund critical mask tools programs. This paper will highlight recent status of mask projects and longer term strategic direction at the MBDC. It is important that mask technology be ready to support pilot line development HVM by 2013. In several areas progress has been made but a continued collaborative effort will be needed along with timely infrastructure investments to meet these challenging goals.

LONG DURATION FLARE EMISSION: IMPULSIVE HEATING OR GRADUAL HEATING?

DOE Office of Scientific and Technical Information (OSTI.GOV)

Qiu, Jiong; Longcope, Dana W.

Flare emissions in X-ray and EUV wavelengths have previously been modeled as the plasma response to impulsive heating from magnetic reconnection. Some flares exhibit gradually evolving X-ray and EUV light curves, which are believed to result from superposition of an extended sequence of impulsive heating events occurring in different adjacent loops or even unresolved threads within each loop. In this paper, we apply this approach to a long duration two-ribbon flare SOL2011-09-13T22 observed by the Atmosphere Imaging Assembly (AIA). We find that to reconcile with observed signatures of flare emission in multiple EUV wavelengths, each thread should be heated inmore » two phases, an intense impulsive heating followed by a gradual, low-rate heating tail that is attenuated over 20–30 minutes. Each AIA resolved single loop may be composed of several such threads. The two-phase heating scenario is supported by modeling with both a zero-dimensional and a 1D hydrodynamic code. We discuss viable physical mechanisms for the two-phase heating in a post-reconnection thread.« less

Studies of EUV contamination mitigation

NASA Astrophysics Data System (ADS)

Graham, Samual, Jr.; Malinowski, Michael E.; Steinhaus, Chip; Grunow, Philip A.; Klebanoff, Leonard E.

2002-07-01

Carbon contamination removal was investigated using remote RF-O2, RF-H2, and atomic hydrogen experiments. Samples consisted of silicon wafers coated with 100 Angstrom sputtered carbon, as well as bare Si-capped Mo/Si optics. Samples were exposed to atomic hydrogen or RF plasma discharges at 100 W, 200 W, and 300 W. Carbon removal rate, optic oxidation rate, at-wavelength (13.4 nm) peak reflectance, and optic surface roughness were characterized. Data show that RF- O2 removes carbon at a rate approximately 6 times faster RF- H2 for a given discharge power. However, both cleaning techniques induce Mo/Si optic degradation through the loss of reflectivity associated with surface oxide growth for RF-O2 and an unknown mechanism with hydrogen cleaning. Atomic hydrogen cleaning shows carbon removal rates sufficient for use as an in-situ cleaning strategy for EUVoptics with less risk of optic degradation from overexposures than RF-discharge cleaning. While hydrogen cleaning (RF and atomic) of EUV optics has proven effective in carbon removal, attempts to dissociate hydrogen in co-exposures with EUV radiation have resulted in no detectable removal of carbon contamination.

Uncertainties in (E)UV model atmosphere fluxes

NASA Astrophysics Data System (ADS)

Rauch, T.

2008-04-01

Context: During the comparison of synthetic spectra calculated with two NLTE model atmosphere codes, namely TMAP and TLUSTY, we encounter systematic differences in the EUV fluxes due to the treatment of level dissolution by pressure ionization. Aims: In the case of Sirius B, we demonstrate an uncertainty in modeling the EUV flux reliably in order to challenge theoreticians to improve the theory of level dissolution. Methods: We calculated synthetic spectra for hot, compact stars using state-of-the-art NLTE model-atmosphere techniques. Results: Systematic differences may occur due to a code-specific cutoff frequency of the H I Lyman bound-free opacity. This is the case for TMAP and TLUSTY. Both codes predict the same flux level at wavelengths lower than about 1500 Å for stars with effective temperatures (T_eff) below about 30 000 K only, if the same cutoff frequency is chosen. Conclusions: The theory of level dissolution in high-density plasmas, which is available for hydrogen only should be generalized to all species. Especially, the cutoff frequencies for the bound-free opacities should be defined in order to make predictions of UV fluxes more reliable.

Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography

NASA Astrophysics Data System (ADS)

Wang, L.; Kirk, E.; Wäckerlin, C.; Schneider, C. W.; Hojeij, M.; Gobrecht, J.; Ekinci, Y.

2014-06-01

We present fabrication and characterization of high-resolution and nearly amorphous Mo1 - xNx transmission gratings and their use as masks for extreme ultraviolet (EUV) interference lithography. During sputter deposition of Mo, nitrogen is incorporated into the film by addition of N2 to the Ar sputter gas, leading to suppression of Mo grain growth and resulting in smooth and homogeneous thin films with a negligible grain size. The obtained Mo0.8N0.2 thin films, as determined by x-ray photoelectron spectroscopy, are characterized to be nearly amorphous using x-ray diffraction. We demonstrate a greatly reduced Mo0.8N0.2 grating line edge roughness compared with pure Mo grating structures after e-beam lithography and plasma dry etching. The amorphous Mo0.8N0.2 thin films retain, to a large extent, the benefits of Mo as a phase grating material for EUV wavelengths, providing great advantages for fabrication of highly efficient diffraction gratings with extremely low roughness. Using these grating masks, well-resolved dense lines down to 8 nm half-pitch are fabricated with EUV interference lithography.

Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography

NASA Astrophysics Data System (ADS)

Buitrago, Elizabeth; Nagahara, Seiji; Yildirim, Oktay; Nakagawa, Hisashi; Tagawa, Seiichi; Meeuwissen, Marieke; Nagai, Tomoki; Naruoka, Takehiko; Verspaget, Coen; Hoefnagels, Rik; Rispens, Gijsbert; Shiraishi, Gosuke; Terashita, Yuichi; Minekawa, Yukie; Yoshihara, Kosuke; Oshima, Akihiro; Vockenhuber, Michaela; Ekinci, Yasin

2016-07-01

Extreme ultraviolet lithography (EUVL, λ=13.5 nm) is the most promising candidate to manufacture electronic devices for future technology nodes in the semiconductor industry. Nonetheless, EUVL still faces many technological challenges as it moves toward high-volume manufacturing (HVM). A key bottleneck from the tool design and performance point of view has been the development of an efficient, high-power EUV light source for high throughput production. Consequently, there has been extensive research on different methodologies to enhance EUV resist sensitivity. Resist performance is measured in terms of its ultimate printing resolution, line width roughness (LWR), sensitivity [S or best energy (BE)], and exposure latitude (EL). However, there are well-known fundamental trade-off relationships (line width roughness, resolution and sensitivity trade-off) among these parameters for chemically amplified resists (CARs). We present early proof-of-principle results for a multiexposure lithography process that has the potential for high sensitivity enhancement without compromising other important performance characteristics by the use of a "Photosensitized Chemically Amplified Resist™" (PSCAR™). With this method, we seek to increase the sensitivity by combining a first EUV pattern exposure with a second UV-flood exposure (λ=365 nm) and the use of a PSCAR. In addition, we have evaluated over 50 different state-of-the-art EUV CARs. Among these, we have identified several promising candidates that simultaneously meet sensitivity, LWR, and EL high-performance requirements with the aim of resolving line space (L/S) features for the 7- and 5-nm logic node [16- and 13-nm half-pitch (HP), respectively] for HVM. Several CARs were additionally found to be well resolved down to 12- and 11-nm HP with minimal pattern collapse and bridging, a remarkable feat for CARs. Finally, the performance of two negative tone state-of-the-art alternative resist platforms previously investigated was compared to the CAR performance at and below 16-nm HP resolution, demonstrating the need for alternative resist solutions at 13-nm resolution and below. EUV interference lithography (IL) has provided and continues to provide a simple yet powerful platform for academic and industrial research, enabling the characterization and development of resist materials before commercial EUV exposure tools become available. Our experiments have been performed at the EUV-IL set-up in the Swiss Light Source (SLS) synchrotron facility located at the Paul Scherrer Institute (PSI).

Plasma hydrodynamics of the intense laser-cluster interaction*

NASA Astrophysics Data System (ADS)

Milchberg, Howard

2002-11-01

We present a 1D hydrodynamic model of the intense laser-cluster interaction in which the laser field is treated self-consistently. We find that for clusters initially as small as 25Å in radius, for which the hydrodynamic model is appropriate, nonuniform expansion of the heated material results in long-time resonance of the laser field at the critical density plasma layer. A significant result of this is that the ponderomotive force, which is enhanced at the critical density surface, can be large enough to strongly modify the plasma hydrodynamics, even at laser intensities as low as 10^15 W/cm^2 for 800 nm laser pulses. Recent experiments in EUV and x-ray generation as a function of laser pulsewidth [1], and femtosecond time-resolved measurements of cluster transient polarizability [2] provide strong support for the basic physics of this model. Recent results using a 2D hybrid fluid/PIC code show qualitative agreement with the 1D hydrocode [3]. *Work supported by the National Science Foundation and the EUV-LLC. 1. E. Parra, I. Alexeev, J. Fan, K. Kim, S.J. McNaught, and H. M. Milchberg, Phys. Rev. E 62, R5931 (2000). 2. K.Y. Kim, I. Alexeev, E. Parra, and H.M. Milchberg, submitted for publication. 3. T. Taguchi, T. Antonsen, and H.M Milchberg, this meeting.

TIMED/GUVI Observations of Aurora, Ionosphere, Thermosphere and Solar EUV Variations

NASA Astrophysics Data System (ADS)

Zhang, Y.; Paxton, L. J.; Schaefer, R. K.

2017-12-01

The FUV (100-200 nm) emissions from the ionosphere and thermosphere carry rich information of the density and composition of the IT system, aurora and solar EUV flux. The key emissions include atomic hydrogen line (121.6nm), atomic oxygen lines (e.g. 130.4, 135.6, 164.1 nm), atomic nitrogen lines (e.g. 120.0, 149.3, 174.3 nm), molecular nitrogen bands (LBH and VK bands) and nitric oxide ɛ bands. TIMED/GUVI data cover the nearly full FUV range and generate many space weather products (ionosphere, thermosphere, aurora and solar EUV) that extend the products from other missions (such as NASA GOLD and ICON) and help to solve some of MIT (Magnetosphere-Ionosphere-Thermosphere) science problems and serve as validation data sources for models.

Results from a Grazing Incidence X-Ray Interferometer

NASA Technical Reports Server (NTRS)

Joy, Marshall K.; Shipley, Ann; Cash, Webster; Carter, James

2000-01-01

A prototype grazing incidence interferometer has been built and tested at EUV and X-ray wavelengths using a 120 meter long vacuum test facility at Marshall Space Flight Center. We describe the design and construction of the interferometer, the EUV and x-ray sources, the detector systems, and compare the interferometric fringe measurements with theoretical predictions. We also describe the next-generation grazing incidence system which is designed to provide laboratory demonstration of key technologies that will be needed for a space-based x-ray interferometer.

The Formation and Early Evolution of a Coronal Mass Ejection and its Associated Shock Wave on 2014 January 8

NASA Astrophysics Data System (ADS)

Wan, Linfeng; Cheng, Xin; Shi, Tong; Su, Wei; Ding, M. D.

2016-08-01

In this paper, we study the formation and early evolution of a limb coronal mass ejection (CME) and its associated shock wave that occurred on 2014 January 8. The extreme ultraviolet (EUV) images provided by the Atmospheric Imaging Assembly (AIA) on board the Solar Dynamics Observatory disclose that the CME first appears as a bubble-like structure. Subsequently, its expansion forms the CME and causes a quasi-circular EUV wave. Interestingly, both the CME and the wave front are clearly visible at all of the AIA EUV passbands. Through a detailed kinematical analysis, it is found that the expansion of the CME undergoes two phases: a first phase with a strong but transient lateral over-expansion followed by a second phase with a self-similar expansion. The temporal evolution of the expansion velocity coincides very well with the variation of the 25-50 keV hard X-ray flux of the associated flare, which indicates that magnetic reconnection most likely plays an important role in driving the expansion. Moreover, we find that, when the velocity of the CME reaches ˜600 km s-1, the EUV wave starts to evolve into a shock wave, which is evidenced by the appearance of a type II radio burst. The shock’s formation height is estimated to be ˜0.2 R sun, which is much lower than the height derived previously. Finally, we also study the thermal properties of the CME and the EUV wave. We find that the plasma in the CME leading front and the wave front has a temperature of ˜2 MK, while that in the CME core region and the flare region has a much higher temperature of ≥8 MK.

Compact advanced extreme-ultraviolet imaging spectrometer for spatiotemporally varying tungsten spectra from fusion plasmas.

PubMed

Song, Inwoo; Seon, C R; Hong, Joohwan; An, Y H; Barnsley, R; Guirlet, R; Choe, Wonho

2017-09-01

A compact advanced extreme-ultraviolet (EUV) spectrometer operating in the EUV wavelength range of a few nanometers to measure spatially resolved line emissions from tungsten (W) was developed for studying W transport in fusion plasmas. This system consists of two perpendicularly crossed slits-an entrance aperture and a space-resolved slit-inside a chamber operating as a pinhole, which enables the system to obtain a spatial distribution of line emissions. Moreover, a so-called v-shaped slit was devised to manage the aperture size for measuring the spatial resolution of the system caused by the finite width of the pinhole. A back-illuminated charge-coupled device was used as a detector with 2048 × 512 active pixels, each with dimensions of 13.5 × 13.5 μm 2 . After the alignment and installation on Korea superconducting tokamak advanced research, the preliminary results were obtained during the 2016 campaign. Several well-known carbon atomic lines in the 2-7 nm range originating from intrinsic carbon impurities were observed and used for wavelength calibration. Further, the time behavior of their spatial distributions is presented.

Debunking the Myth of Two-Temperature Coronae for RS CVn Systems Using Contemporaneous

NASA Astrophysics Data System (ADS)

Linsky, Jeffrey L.

For many years the standard analysis of low energy resolution x-ray observations of active late-type stars with the IPC, PSPC, TGS, and SSS has been to assume that the stellar coronae have plasma at only two temperatures. This type of analysis is constrained by the small information content and limited bandpass of the data but has NO PHYSICAL BASIS WHATSOEVER. We propose to test this hypothesis and to go beyond it to derive continuous emission measure distributions for the coronae of three very bright RS CVn systems (sigma-2 Cor Bor, UX Ari and VY Ari) using CONTEMPORANEOUS high resolution EUVE spectra and the improved x-ray energy resolution of ASCA. EUVE provides Fe lines with a broad range of ionization to derive the emission measure EM(T) independent of any uncertainties in the coronal abundances, while ASCA provides information on the hot plasma as seen in blended features of Mg, Si, S, and Fe and can test for coronal abundances different from the photosphere. We will model the quiescent and flare emission with magnetic loops.

The Plasmasphere as "Seen" by the IMAGE Mission

NASA Technical Reports Server (NTRS)

Gallagher, D. L.; Green, J. L.; Fung, S. F.; Benson, R. F.; Sandel, B. R.; Carpenter, D. L.

1999-01-01

The Imager for Magnetopause-to-Aurora Global Exploration (IMAGE) is the first mission designed exclusively to remotely measure the magnetosphere. As such, it will reveal the ring current, plasmasphere, polar cusp, and magnetopause as whole extended, interacting systems. For the first time, our impressions of the global magnetosphere, synthesized through many years of whistler and in situ measurement, will be replaced by images. The overall morphology of each system of plasma and the correspondence of changes between them in response to the sun and solar wind will become available. The Extreme Ultraviolet Imager (EUV) and the Radio Plasma Imager (RPI) are the two IMAGE instruments which will remotely measure and image the plasmasphere. What we expect to "see" from these instruments and how it may be interpreted is the subject of this presentation. The EUV instrument includes three optical cameras, with an almost 90 degree field of view, transverse to the spin axis. EUV is designed to see He+ ions in resonantly scatter solar light at 30.4rim. The IMAGE spacecraft will spin with a period of about 2 minutes, with its spin axis parallel to the orbit normal. The IMAGE orbit will be highly inclined, with a high latitude apogee at a geocentric distance of 8RE and perigee of about 1.2RE. The normal observing integration time of 10 minutes will easily see to the outer edge of the plasmasphere. The RPI instrument makes use of three orthoganal dipole antennas: two in the spin plane with a tip-to-tip length of 500m and one along the spin axis with a length of 20 meters. Using coded pulse transmissions, the RPI instrument will broadcast from 3kHz to 3MHz. With one minute resolution, plasma densities from about 0.1 cm(exp -3) to 100,000 cm(exp -3), along with line-of-sight bulk velocities and locations, will be obtained from all returned radio wave signals. When transmitting from the high latitude magnetospheric cavity, RPI will measure density profiles for the major plasma structures in the magnetosphere, including the magnetopause, polar cusp, and plasmasphere. RPI should also see isolated density irregularities and possibly the plasma sheet. Observations The EUV instrument will return line-of-sight integrated images through the optically thin helium medium of the plasmasphere and magnetosphere. A variety of techniques have been suggested for the translation of the images into physically useful data, such as plasmapause location and three dimensional density distribution. The RPI instrument will return quantitative density values and line-of-sight velocity as a function of position along reflecting wave propagation paths. How they may be used individually and together to study plasmaspheric dynamics and global structure will be discussed. Attention will also be given to the data products and how access to IMAGE data will be provided by the IMAGE team and the NSSDC.

Evidence for Widespread Cooling in an Active Region Observed with the SDO Atmospheric Imaging Assembly

NASA Technical Reports Server (NTRS)

Viall, Nicholeen M.; Klimchuk, James A.

2012-01-01

A well known behavior of EUV light curves of discrete coronal loops is that the peak intensities of cooler channels or spectral lines are reached at progressively later times. This time lag is understood to be the result of hot coronal loop plasma cooling through these lower respective temperatures. However, loops typically comprise only a minority of the total emission in active regions. Is this cooling pattern a common property of active region coronal plasma, or does it only occur in unique circumstances, locations, and times? The new SDO/AIA data provide a wonderful opportunity to answer this question systematically for an entire active region. We measure the time lag between pairs of SDO/AIA EUV channels using 24 hours of images of AR 11082 observed on 19 June 2010. We find that there is a time-lag signal consistent with cooling plasma, just as is usually found for loops, throughout the active region including the diffuse emission between loops for the entire 24 hour duration. The pattern persists consistently for all channel pairs and choice of window length within the 24 hour time period, giving us confidence that the plasma is cooling from temperatures of greater than 3 MK, and sometimes exceeding 7 MK, down to temperatures lower than approx. 0.8 MK. This suggests that the bulk of the emitting coronal plasma in this active region is not steady; rather, it is dynamic and constantly evolving. These measurements provide crucial constraints on any model which seeks to describe coronal heating.

Estimation of soft X-ray and EUV transition radiation power emitted from the MIRRORCLE-type tabletop synchrotron.

PubMed

Toyosugi, N; Yamada, H; Minkov, D; Morita, M; Yamaguchi, T; Imai, S

2007-03-01

The tabletop synchrotron light sources MIRRORCLE-6X and MIRRORCLE-20SX, operating at electron energies E(el) = 6 MeV and E(el) = 20 MeV, respectively, can emit powerful transition radiation (TR) in the extreme ultraviolet (EUV) and the soft X-ray regions. To clarify the applicability of these soft X-ray and EUV sources, the total TR power has been determined. A TR experiment was performed using a 385 nm-thick Al foil target in MIRRORCLE-6X. The angular distribution of the emitted power was measured using a detector assembly based on an NE102 scintillator, an optical bundle and a photomultiplier. The maximal measured total TR power for MIRRORCLE-6X is P(max) approximately equal 2.95 mW at full power operation. Introduction of an analytical expression for the lifetime of the electron beam allows calculation of the emitted TR power by a tabletop synchrotron light source. Using the above measurement result, and the theoretically determined ratio between the TR power for MIRRORCLE-6X and MIRRORCLE-20SX, the total TR power for MIRRORCLE-20SX can be obtained. The one-foil TR target thickness is optimized for the 20 MeV electron energy. P(max) approximately equal 810 mW for MIRRORCLE-20SX is obtained with a single foil of 240 nm-thick Be target. The emitted bremsstrahlung is negligible with respect to the emitted TR for optimized TR targets. From a theoretically known TR spectrum it is concluded that MIRRORCLE-20SX can emit 150 mW of photons with E > 500 eV, which makes it applicable as a source for performing X-ray lithography. The average wavelength, \\overline\\lambda = 13.6 nm, of the TR emission of MIRRORCLE-20SX, with a 200 nm Al target, could provide of the order of 1 W EUV.

Field-of-View Guiding Camera on the HISAKI (SPRINT-A) Satellite

NASA Astrophysics Data System (ADS)

Yamazaki, A.; Tsuchiya, F.; Sakanoi, T.; Uemizu, K.; Yoshioka, K.; Murakami, G.; Kagitani, M.; Kasaba, Y.; Yoshikawa, I.; Terada, N.; Kimura, T.; Sakai, S.; Nakaya, K.; Fukuda, S.; Sawai, S.

2014-11-01

HISAKI (SPRINT-A) satellite is an earth-orbiting Extreme UltraViolet (EUV) spectroscopic mission and launched on 14 Sep. 2013 by the launch vehicle Epsilon-1. Extreme ultraviolet spectroscope (EXCEED) onboard the satellite will investigate plasma dynamics in Jupiter's inner magnetosphere and atmospheric escape from Venus and Mars. EUV spectroscopy is useful to measure electron density and temperature and ion composition in plasma environment. EXCEED also has an advantage to measure spatial distribution of plasmas around the planets. To measure radial plasma distribution in the Jovian inner magnetosphere and plasma emissions from ionosphere, exosphere and tail separately (for Venus and Mars), the pointing accuracy of the spectroscope should be smaller than spatial structures of interest (20 arc-seconds). For satellites in the low earth orbit (LEO), the pointing displacement is generally caused by change of alignment between the satellite bus module and the telescope due to the changing thermal inputs from the Sun and Earth. The HISAKI satellite is designed to compensate the displacement by tracking the target with using a Field-Of-View (FOV) guiding camera. Initial checkout of the attitude control for the EXCEED observation shows that pointing accuracy kept within 2 arc-seconds in a case of "track mode" which is used for Jupiter observation. For observations of Mercury, Venus, Mars, and Saturn, the entire disk will be guided inside slit to observe plasma around the planets. Since the FOV camera does not capture the disk in this case, the satellite uses a star tracker (STT) to hold the attitude ("hold mode"). Pointing accuracy during this mode has been 20-25 arc-seconds. It has been confirmed that the attitude control works well as designed.

Theoretical modeling of PEB procedure on EUV resist using FDM formulation

NASA Astrophysics Data System (ADS)

Kim, Muyoung; Moon, Junghwan; Choi, Joonmyung; Lee, Byunghoon; Jeong, Changyoung; Kim, Heebom; Cho, Maenghyo

2018-03-01

Semiconductor manufacturing industry has reduced the size of wafer for enhanced productivity and performance, and Extreme Ultraviolet (EUV) light source is considered as a promising solution for downsizing. A series of EUV lithography procedures contain complex photo-chemical reaction on photoresist, and it causes technical difficulties on constructing theoretical framework which facilitates rigorous investigation of underlying mechanism. Thus, we formulated finite difference method (FDM) model of post exposure bake (PEB) process on positive chemically amplified resist (CAR), and it involved acid diffusion coupled-deprotection reaction. The model is based on Fick's second law and first-order chemical reaction rate law for diffusion and deprotection, respectively. Two kinetic parameters, diffusion coefficient of acid and rate constant of deprotection, which were obtained by experiment and atomic scale simulation were applied to the model. As a result, we obtained time evolutional protecting ratio of each functional group in resist monomer which can be used to predict resulting polymer morphology after overall chemical reactions. This achievement will be the cornerstone of multiscale modeling which provides fundamental understanding on important factors for EUV performance and rational design of the next-generation photoresist.

Annual variations in the Martian bow shock location as observed by the Mars Express mission

NASA Astrophysics Data System (ADS)

Hall, B. E. S.; Lester, M.; Sánchez-Cano, B.; Nichols, J. D.; Andrews, D. J.; Edberg, N. J. T.; Opgenoorth, H. J.; Fränz, M.; Holmström, M.; Ramstad, R.; Witasse, O.; Cartacci, M.; Cicchetti, A.; Noschese, R.; Orosei, R.

2016-11-01

The Martian bow shock distance has previously been shown to be anticorrelated with solar wind dynamic pressure but correlated with solar extreme ultraviolet (EUV) irradiance. Since both of these solar parameters reduce with the square of the distance from the Sun, and Mars' orbit about the Sun increases by ˜0.3 AU from perihelion to aphelion, it is not clear how the bow shock location will respond to variations in these solar parameters, if at all, throughout its orbit. In order to characterize such a response, we use more than 5 Martian years of Mars Express Analyser of Space Plasma and EneRgetic Atoms (ASPERA-3) Electron Spectrometer measurements to automatically identify 11,861 bow shock crossings. We have discovered that the bow shock distance as a function of solar longitude has a minimum of 2.39RM around aphelion and proceeds to a maximum of 2.65RM around perihelion, presenting an overall variation of ˜11% throughout the Martian orbit. We have verified previous findings that the bow shock in southern hemisphere is on average located farther away from Mars than in the northern hemisphere. However, this hemispherical asymmetry is small (total distance variation of ˜2.4%), and the same annual variations occur irrespective of the hemisphere. We have identified that the bow shock location is more sensitive to variations in the solar EUV irradiance than to solar wind dynamic pressure variations. We have proposed possible interaction mechanisms between the solar EUV flux and Martian plasma environment that could explain this annual variation in bow shock location.

Creating space plasma from the ground

NASA Astrophysics Data System (ADS)

Carlson, H. C.; Djuth, F. T.; Zhang, L. D.

2017-01-01

We have performed an experiment to compare as directly as realizable the ionization production rate by HF radio wave energy versus by solar EUV. We take advantage of the commonality that ionization production by both ground-based high-power HF radio waves and by solar EUV is driven by primary and secondary suprathermal electrons near and above 20 eV. Incoherent scatter radar (ISR) plasma-line amplitudes are used as a measure of suprathermal electron fluxes for ISR wavelengths near those for 430 MHz and are indeed a clean measure of such for those fluxes sufficiently weak to have negligible self-damping. We present data from an HF heating experiment on November 2015 at Arecibo, which even more directly confirm the only prior midlatitude estimate, of order 10% efficiency for conversion of HF energy to ionospheric ionization. We note the theoretical maximum possible is 1/3, while 1% or less reduces the question to near practical irrelevance. Our measurements explicitly confirm the prediction that radio-frequency production of artificial ionospheres can be practicable, even at midlatitudes. Furthermore, that this midlatitude efficiency is comparable to efficiencies measured at high latitudes (which include enhancements unique to high latitudes including magnetic zenith effect, gyrofrequency multiples, and double resonances) requires reexamination of current theoretical thinking about soft-electron acceleration processes in weakly magnetized plasmas. The implications are that electron acceleration by any of a variety of processes may be a fundamental underpinning to energy redistribution in space plasmas.

Advanced EUV mask and imaging modeling

NASA Astrophysics Data System (ADS)

Evanschitzky, Peter; Erdmann, Andreas

2017-10-01

The exploration and optimization of image formation in partially coherent EUV projection systems with complex source shapes requires flexible, accurate, and efficient simulation models. This paper reviews advanced mask diffraction and imaging models for the highly accurate and fast simulation of EUV lithography systems, addressing important aspects of the current technical developments. The simulation of light diffraction from the mask employs an extended rigorous coupled wave analysis (RCWA) approach, which is optimized for EUV applications. In order to be able to deal with current EUV simulation requirements, several additional models are included in the extended RCWA approach: a field decomposition and a field stitching technique enable the simulation of larger complex structured mask areas. An EUV multilayer defect model including a database approach makes the fast and fully rigorous defect simulation and defect repair simulation possible. A hybrid mask simulation approach combining real and ideal mask parts allows the detailed investigation of the origin of different mask 3-D effects. The image computation is done with a fully vectorial Abbe-based approach. Arbitrary illumination and polarization schemes and adapted rigorous mask simulations guarantee a high accuracy. A fully vectorial sampling-free description of the pupil with Zernikes and Jones pupils and an optimized representation of the diffraction spectrum enable the computation of high-resolution images with high accuracy and short simulation times. A new pellicle model supports the simulation of arbitrary membrane stacks, pellicle distortions, and particles/defects on top of the pellicle. Finally, an extension for highly accurate anamorphic imaging simulations is included. The application of the models is demonstrated by typical use cases.

A tiny event producing an interplanetary type III burst

NASA Astrophysics Data System (ADS)

Alissandrakis, C. E.; Nindos, A.; Patsourakos, S.; Kontogeorgos, A.; Tsitsipis, P.

2015-10-01

Aims: We investigate the conditions under which small-scale energy release events in the low corona gave rise to strong interplanetary (IP) type III bursts. Methods: We analyzed observations of three tiny events, detected by the Nançay Radio Heliograph (NRH), two of which produced IP type III bursts. We took advantage of the NRH positioning information and of the high cadence of AIA/SDO data to identify the associated extreme-UV (EUV) emissions. We measured positions and time profiles of the metric and EUV sources. Results: We found that the EUV events that produced IP type III bursts were located near a coronal hole boundary, while the one that did not was located in a closed magnetic field region. In all three cases tiny flaring loops were involved, without any associated mass eruption. In the best observed case, the radio emission at the highest frequency (435 MHz) was displaced by ~55'' with respect to the small flaring loop. The metric type III emission shows a complex structure in space and in time, indicative of multiple electron beams, despite the low intensity of the events. From the combined analysis of dynamic spectra and NRH images, we derived the electron beam velocity as well as the height, ambient plasma temperature, and density at the level of formation of the 160 MHz emission. From the analysis of the differential emission measure derived from the AIA images, we found that the first evidence of energy release was at the footpoints, and this was followed by the development of flaring loops and subsequent cooling. Conclusions: Even small energy release events can accelerate enough electrons to give rise to powerful IP type III bursts. The proximity of the electron acceleration site to open magnetic field lines facilitates the escape of the electrons into the interplanetary space. The offset between the site of energy release and the metric type III location warrants further investigation. The movie is available in electronic form at http://www.aanda.org

EPE fundamentals and impact of EUV: Will traditional design-rule calculations work in the era of EUV?

NASA Astrophysics Data System (ADS)

Gabor, Allen H.; Brendler, Andrew C.; Brunner, Timothy A.; Chen, Xuemei; Culp, James A.; Levinson, Harry J.

2018-03-01

The relationship between edge placement error, semiconductor design-rule determination and predicted yield in the era of EUV lithography is examined. This paper starts with the basics of edge placement error and then builds up to design-rule calculations. We show that edge placement error (EPE) definitions can be used as the building blocks for design-rule equations but that in the last several years the term "EPE" has been used in the literature to refer to many patterning errors that are not EPE. We then explore the concept of "Good Fields"1 and use it predict the n-sigma value needed for design-rule determination. Specifically, fundamental yield calculations based on the failure opportunities per chip are used to determine at what n-sigma "value" design-rules need to be tested to ensure high yield. The "value" can be a space between two features, an intersect area between two features, a minimum area of a feature, etc. It is shown that across chip variation of design-rule important values needs to be tested at sigma values between seven and eight which is much higher than the four-sigma values traditionally used for design-rule determination. After recommending new statistics be used for design-rule calculations the paper examines the impact of EUV lithography on sources of variation important for design-rule calculations. We show that stochastics can be treated as an effective dose variation that is fully sampled across every chip. Combining the increased within chip variation from EUV with the understanding that across chip variation of design-rule important values needs to not cause a yield loss at significantly higher sigma values than have traditionally been looked at, the conclusion is reached that across-wafer, wafer-to-wafer and lot-to-lot variation will have to overscale for any technology introducing EUV lithography where stochastic noise is a significant fraction of the effective dose variation. We will emphasize stochastic effects on edge placement error distributions and appropriate design-rule setting. While CD distributions with long tails coming from stochastic effects do bring increased risk of failure (especially on chips that may have over a billion failure opportunities per layer) there are other sources of variation that have sharp cutoffs, i.e. have no tails. We will review these sources and show how distributions with different skew and kurtosis values combine.

High efficiency spectrographs for the EUV and soft X-rays

NASA Technical Reports Server (NTRS)

Cash, W.

1983-01-01

The use of grazing incidence optics and reflection grating designs is shown to be a method that improves the performance of spectrographs at wavelengths shorter than 1200 A. Emphasis is laid on spectroscopic designs for X ray and EUV astronomy, with sample designs for an objective reflection grating spectrograph (ORGS) and an echelle spectrograph for wavelengths longer than 100 A. Conical diffraction allows operations at grazing incidence in the echelle spectrograph. In ORGS, the extreme distance of X ray objects aids in collimating the source radiation, which encounters conical diffraction within the instrument, proceeds parallel to the optical axis, and arrives at the detector. A series of gratings is used to achieve the effect. A grazing echelle is employed for EUV observations, and offers a resolution of 20,000 over a 300 A bandpass.

Topside Ionospheric Response to Solar EUV Variability

NASA Astrophysics Data System (ADS)

Anderson, P. C.; Hawkins, J.

2015-12-01

We present an analysis of 23 years of thermal plasma measurements in the topside ionosphere from several DMSP spacecraft at ~800 km. The solar cycle variations of the daily averaged densities, temperatures, and H+/O+ ratios show a strong relationship to the solar EUV as described by the E10.7 solar EUV proxy with cross-correlation coefficients (CCCs) with the density greater than 0.85. The H+/O+ varies dramatically from solar maximum when it is O+ dominated to solar minimum when it is H+ dominated. These ionospheric parameters also vary strongly with season, particularly at latitudes well away from the equator where the solar zenith angle (SZA) varies greatly with season. There are strong 27-day solar rotation periodicities in the density, associated with the periodicities in the solar EUV as measured by the TIMED SEE and SDO EVE instruments, with CCCs at times greater than 0.9 at selected wavelengths. Empirical Orthogonal Function (EOF) analysis captures over 95% of the variation in the density over the 23 years in the first two principle components. The first principle component (PC1) is clearly associated with the solar EUV showing a 0.91 CCC with the E10.7 proxy while the PC1 EOFs remain relatively constant with latitude indicating that the solar EUV effects are relatively independent of latitude. The second principle component (PC2) is clearly associated with the SZA variation, showing strong correlations with the SZA and the concomitant density variations at latitudes away from the equator and with the PC2 EOFs having magnitudes near zero at the equator and maximum at high latitude. The magnitude of the variation of the response of the topside ionosphere to solar EUV variability is shown to be closely related to the composition. This is interpreted as the result of the effect of composition on the scale height in the topside ionosphere and the "pivot effect" in which the variation in density near the F2 peak is expected to be amplified by a factor of e at an altitude a scale height above the F2 peak. When the topside ionosphere is H+ dominated, DMSP may be much less than a scale height above the F2 peak while when it is O+ dominated, DMSP may be several scale heights above the F2 peak.

Origin and Ion Charge State Evolution of Solar Wind Transients 4 - 7 August 2011

NASA Astrophysics Data System (ADS)

Rodkin, Denis; Goryaev, Farid; Pagano, Paolo; Gibb, Gordon; Slemzin, Vladimir; Shugay, Yulia; Veselovsky, Igor; Mackay, Duncan

2017-04-01

Identification of transients and their origins on the Sun is one of the most important problems of the space weather forecasting. In our work, we present a case study of the complex event consisting of several solar wind transients detected by ACE on 4 - 7 August 2011, that caused a geomagnetic storm with Dst= - 110 nT. The supposed coronal sources - three flares and coronal mass ejections (CMEs) occurred on 2 - 4 August 2011 in the active region AR 11261. To investigate the solar origins and formation of these transients, we studied kinematic and thermodynamic properties of expanding coronal structures using the SDO/AIA EUV images and the differential emission measure (DEM) diagnostics. The Helioseismic and Magnetic Imager (HMI) magnetic field maps were used as the input data for the 3D numerical model to describe the flux rope ejection. We characterize the early phase of the flux rope ejection in the corona, where the usual three-component CME structure formed. The flux rope ejected with the speed about 200 km/s to the height of 0.25 Rsun. The kinematics of the modeled CME front well agrees with the STEREO EUV measurements. Using the results of the plasma diagnostics and MHD modeling, we calculated the ion charge ratios of carbon and oxygen as well as the mean charge state of iron ions of the 2 August 2011 CME taking into account the processes of heating, cooling, expansion, ionization and recombination of the moving plasma in the corona up to the freeze-in region. We estimated a probable heating rate of the CME plasma in the low corona by matching the calculated ion composition parameters of the CME with that measured in-situ parameters of the solar wind transients. We also consider the similarities and discrepancies between the results of the MHD simulation and the observation of the event. Our results show that analysis of the ion composition of CMEs enables to disclose a relationship between parameters of the solar wind transients and properties of their solar origins, which opens new possibilities to validate and improve the solar wind forecasting models.

Ultra-short wavelength x-ray system

DOEpatents

Umstadter, Donald [Ann Arbor, MI; He, Fei [Ann Arbor, MI; Lau, Yue-Ying [Potomac, MD

2008-01-22

A method and apparatus to generate a beam of coherent light including x-rays or XUV by colliding a high-intensity laser pulse with an electron beam that is accelerated by a synchronized laser pulse. Applications include x-ray and EUV lithography, protein structural analysis, plasma diagnostics, x-ray diffraction, crack analysis, non-destructive testing, surface science and ultrafast science.

Solar Tornadoes Triggered by Interaction between Filaments and EUV Jets

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chen, Huadong; Zhang, Jun; Ma, Suli

We investigate the formations and evolutions of two successive solar tornadoes in/near AR 12297 during 2015 March 19–20. Recurrent EUV jets close to two filaments were detected along a large-scale coronal loop prior to the appearances of the tornadoes. Under the disturbances from the activities, the filaments continually ascended and finally interacted with the loops tracked by the jets. Subsequently, the structures of the filaments and the loop were merged together, probably via magnetic reconnections, and formed tornado-like structures with a long spiral arm. Our observations suggest that solar tornadoes can be triggered by the interaction between filaments and nearbymore » coronal jets, which has rarely been reported before. At the earlier development phase of the first tornado, about 30 small-scale sub-jets appeared in the tornado’s arm, accompanied by local EUV brightenings. They have an ejection direction approximately vertical to the axis of the arm and a typical maximum speed of ∼280 km s{sup −1}. During the ruinations of the two tornadoes, fast plasma outflows from the strong EUV brightenings inside tornadoes are observed, in company with the untangling or unwinding of the highly twisted tornado structures. These observational features indicate that self reconnections probably occurred between the tangled magnetic fields of the tornadoes and resulted in the rapid disintegrations and disappearances of the tornadoes. According to the reconnection theory, we also derive the field strength of the tornado core to be ∼8 G.« less

Solar Tornadoes Triggered by Interaction between Filaments and EUV Jets

NASA Astrophysics Data System (ADS)

Chen, Huadong; Zhang, Jun; Ma, Suli; Yan, Xiaoli; Xue, Jianchao

2017-05-01

We investigate the formations and evolutions of two successive solar tornadoes in/near AR 12297 during 2015 March 19-20. Recurrent EUV jets close to two filaments were detected along a large-scale coronal loop prior to the appearances of the tornadoes. Under the disturbances from the activities, the filaments continually ascended and finally interacted with the loops tracked by the jets. Subsequently, the structures of the filaments and the loop were merged together, probably via magnetic reconnections, and formed tornado-like structures with a long spiral arm. Our observations suggest that solar tornadoes can be triggered by the interaction between filaments and nearby coronal jets, which has rarely been reported before. At the earlier development phase of the first tornado, about 30 small-scale sub-jets appeared in the tornado’s arm, accompanied by local EUV brightenings. They have an ejection direction approximately vertical to the axis of the arm and a typical maximum speed of ˜280 km s-1. During the ruinations of the two tornadoes, fast plasma outflows from the strong EUV brightenings inside tornadoes are observed, in company with the untangling or unwinding of the highly twisted tornado structures. These observational features indicate that self reconnections probably occurred between the tangled magnetic fields of the tornadoes and resulted in the rapid disintegrations and disappearances of the tornadoes. According to the reconnection theory, we also derive the field strength of the tornado core to be ˜8 G.

Use of molecular oxygen to reduce EUV-induced carbon contamination of optics

NASA Astrophysics Data System (ADS)

Malinowski, Michael E.; Grunow, Philip A.; Steinhaus, Chip; Clift, W. Miles; Klebanoff, Leonard E.

2001-08-01

Carbon deposition and removal experiments on Mo/Si multilayer mirror (MLM) samples were performed using extreme ultraviolet (EUV) light on Beamline 12.0.1.2 of the Advanced Light Source, Lawrence Berkeley National Laboratory (LBNL). Carbon (C) was deposited onto Mo/Si multilayer mirror (MLM) samples when hydrocarbon vapors where intentionally introduced into the MLM test chamber in the presence of EUV at 13.44 nm (92.3eV). The carbon deposits so formed were removed by molecular oxygen + EUV. The MLM reflectivities and photoemission were measured in-situ during these carbon deposition and cleaning procedures. Auger Electron Spectroscopy (AES) sputter-through profiling of the samples was performed after experimental runs to help determine C layer thickness and the near-surface compositional-depth profiles of all samples studied. EUV powers were varied from ~0.2mW/mm2 to 3mW/mm2(at 13.44 nm) during both deposition and cleaning experiments and the oxygen pressure ranged from ~5x10-5 to 5x10-4 Torr during the cleaning experiments. C deposition rates as high as ~8nm/hr were observed, while cleaning rates as high as ~5nm/hr could be achieved when the highest oxygen pressure were used. A limited set of experiments involving intentional oxygen-only exposure of the MLM samples showed that slow oxidation of the MLM surface could occur.

Data indexing techniques for the EUVE all-sky survey

NASA Technical Reports Server (NTRS)

Lewis, J.; Saba, V.; Dobson, C.

1992-01-01

This poster describes techniques developed for manipulating large full-sky data sets for the Extreme Ultraviolet Explorer project. The authors have adapted the quatrilateralized cubic sphere indexing algorithm to allow us to efficiently store and process several types of large data sets, such as full-sky maps of photon counts, exposure time, and count rates. A variation of this scheme is used to index sparser data such as individual photon events and viewing times for selected areas of the sky, which are eventually used to create EUVE source catalogs.

The first Extreme Ultraviolet Explorer source catalog

NASA Technical Reports Server (NTRS)

Bowyer, S.; Lieu, R.; Lampton, M.; Lewis, J.; Wu, X.; Drake, J. J.; Malina, R. F.

1994-01-01

The Extreme Ultraviolet Explorer (EUVE) has conducted an all-sky survey to locate and identify point sources of emission in four extreme ultraviolet wavelength bands centered at approximately 100, 200, 400, and 600 A. A companion deep survey of a strip along half the ecliptic plane was simultaneously conducted. In this catalog we report the sources found in these surveys using rigorously defined criteria uniformly applied to the data set. These are the first surveys to be made in the three longer wavelength bands, and a substantial number of sources were detected in these bands. We present a number of statistical diagnostics of the surveys, including their source counts, their sensitivites, and their positional error distributions. We provide a separate list of those sources reported in the EUVE Bright Source List which did not meet our criteria for inclusion in our primary list. We also provide improved count rate and position estimates for a majority of these sources based on the improved methodology used in this paper. In total, this catalog lists a total of 410 point sources, of which 372 have plausible optical ultraviolet, or X-ray identifications, which are also listed.

Novel EUV mask black border suppressing EUV and DUV OoB light reflection

NASA Astrophysics Data System (ADS)

Ito, Shin; Kodera, Yutaka; Fukugami, Norihito; Komizo, Toru; Maruyama, Shingo; Watanabe, Genta; Yoshida, Itaru; Kotani, Jun; Konishi, Toshio; Haraguchi, Takashi

2016-05-01

EUV lithography is the most promising technology for semiconductor device manufacturing of the 10nm node and beyond. The image border is a pattern free dark area around the die on the photomask serving as transition area between the parts of the mask that is shielded from the exposure light by the Reticle Masking (REMA) blades and the die. When printing a die at dense spacing on an EUV scanner, the reflection from the image border overlaps edges of neighboring dies, affecting CD and contrast in this area. This is related to the fact that EUV absorber stack reflects 1-3% of actinic EUV light. To reduce this effect several types of image border with reduced EUV reflectance (<0.05%) have been proposed; such an image border is referred to as a black border. In particular, an etched multilayer type black border was developed; it was demonstrated that CD impact at the edge of a die is strongly reduced with this type of the black border (BB). However, wafer printing result still showed some CD change in the die influenced by the black border reflection. It was proven that the CD shift was caused by DUV Out of Band (OOB) light from the EUV light source. New types of a multilayer etched BB were evaluated and showed a good potential for DUV light suppression. In this study, a novel BB called `Hybrid Black Border' (HBB) has been developed to eliminate EUV and DUV OOB light reflection by applying optical design technique and special micro-fabrication technique. A new test mask with HBB is fabricated without any degradation of mask quality according to the result of CD performance in the main pattern, defectivity and cleaning durability. The imaging performance for N10 imaging structures is demonstrated on NXE:3300B in collaboration with ASML. This result is compared to the imaging results obtained for a mask with the earlier developed BB, and HBB has achieved ~3x improvement; less than 0.2 nm CD changes are observed in the corners of the die. A CD uniformity budget including impact of OOB light in the die edge area is evaluated which shows that the OOB impact from HBB becomes comparable with other CDU contributors in this area. Finally, we state that HBB is a promising technology allowing for CD control at die edges.

Extreme ultraviolet interferometry

DOE Office of Scientific and Technical Information (OSTI.GOV)

Goldberg, Kenneth A.

EUV lithography is a promising and viable candidate for circuit fabrication with 0.1-micron critical dimension and smaller. In order to achieve diffraction-limited performance, all-reflective multilayer-coated lithographic imaging systems operating near 13-nm wavelength and 0.1 NA have system wavefront tolerances of 0.27 nm, or 0.02 waves RMS. Owing to the highly-sensitive resonant reflective properties of multilayer mirrors and extraordinarily tight tolerances set forth for their fabrication, EUV optical systems require at-wavelength EUV interferometry for final alignment and qualification. This dissertation discusses the development and successful implementation of high-accuracy EUV interferometric techniques. Proof-of-principle experiments with a prototype EUV point-diffraction interferometer for themore » measurement of Fresnel zoneplate lenses first demonstrated sub-wavelength EUV interferometric capability. These experiments spurred the development of the superior phase-shifting point-diffraction interferometer (PS/PDI), which has been implemented for the testing of an all-reflective lithographic-quality EUV optical system. Both systems rely on pinhole diffraction to produce spherical reference wavefronts in a common-path geometry. Extensive experiments demonstrate EUV wavefront-measuring precision beyond 0.02 waves RMS. EUV imaging experiments provide verification of the high-accuracy of the point-diffraction principle, and demonstrate the utility of the measurements in successfully predicting imaging performance. Complementary to the experimental research, several areas of theoretical investigation related to the novel PS/PDI system are presented. First-principles electromagnetic field simulations of pinhole diffraction are conducted to ascertain the upper limits of measurement accuracy and to guide selection of the pinhole diameter. Investigations of the relative merits of different PS/PDI configurations accompany a general study of the most significant sources of systematic measurement errors. To overcome a variety of experimental difficulties, several new methods in interferogram analysis and phase-retrieval were developed: the Fourier-Transform Method of Phase-Shift Determination, which uses Fourier-domain analysis to improve the accuracy of phase-shifting interferometry; the Fourier-Transform Guided Unwrap Method, which was developed to overcome difficulties associated with a high density of mid-spatial-frequency blemishes and which uses a low-spatial-frequency approximation to the measured wavefront to guide the phase unwrapping in the presence of noise; and, finally, an expedient method of Gram-Schmidt orthogonalization which facilitates polynomial basis transformations in wave-front surface fitting procedures.« less

State-of-the-art EUV materials and processes for the 7nm node and beyond

NASA Astrophysics Data System (ADS)

Buitrago, Elizabeth; Meeuwissen, Marieke; Yildirim, Oktay; Custers, Rolf; Hoefnagels, Rik; Rispens, Gijsbert; Vockenhuber, Michaela; Mochi, Iacopo; Fallica, Roberto; Tasdemir, Zuhal; Ekinci, Yasin

2017-03-01

Extreme ultraviolet lithography (EUVL, λ = 13.5 nm) being the most likely candidate to manufacture electronic devices for future technology nodes is to be introduced in high volume manufacturing (HVM) at the 7 nm logic node, at least at critical lithography levels. With this impending introduction, it is clear that excellent resist performance at ultra-high printing resolutions (below 20 nm line/space L/S) is ever more pressing. Nonetheless, EUVL has faced many technical challenges towards this paradigm shift to a new lithography wavelength platform. Since the inception of chemically amplified resists (CARs) they have been the base upon which state-of-the art photoresist technology has been developed from. Resist performance as measured in terms of printing resolution (R), line edge roughness (LER), sensitivity (D or exposure dose) and exposure latitude (EL) needs to be improved but there are well known trade-off relationships (LRS trade-off) among these parameters for CARs that hamper their simultaneous enhancement. Here, we present some of the most promising EUVL materials tested by EUV interference lithography (EUV-IL) with the aim of resolving features down to 11 nm half-pitch (HP), while focusing on resist performance at 16 and 13 nm HP as needed for the 7 and 5 nm node, respectively. EUV-IL has enabled the characterization and development of new resist materials before commercial EUV exposure tools become available and is therefore a powerful research and development tool. With EUV-IL, highresolution periodic images can be printed by the interference of two or more spatially coherent beams through a transmission-diffraction grating mask. For this reason, our experiments have been performed by EUV-IL at Swiss Light Source (SLS) synchrotron facility located at the Paul Scherrer Institute (PSI). Having the opportunity to test hundreds of EUVL materials from vendors and research partners from all over the world, PSI is able to give a global update on some of the most promising materials tested.

Pathways to Earth-like atmospheres. Extreme ultraviolet (EUV)-powered escape of hydrogen-rich protoatmospheres.

PubMed

Lammer, Helmut; Kislyakova, K G; Odert, P; Leitzinger, M; Schwarz, R; Pilat-Lohinger, E; Kulikov, Yu N; Khodachenko, M L; Güdel, M; Hanslmeier, M

2011-12-01

We discuss the evolution of the atmosphere of early Earth and of terrestrial exoplanets which may be capable of sustaining liquid water oceans and continents where life may originate. The formation age of a terrestrial planet, its mass and size, as well as the lifetime in the EUV-saturated early phase of its host star play a significant role in its atmosphere evolution. We show that planets even in orbits within the habitable zone of their host stars might not lose nebular- or catastrophically outgassed initial protoatmospheres completely and could end up as water worlds with CO2 and hydrogen- or oxygen-rich upper atmospheres. If an atmosphere of a terrestrial planet evolves to an N2-rich atmosphere too early in its lifetime, the atmosphere may be lost. We show that the initial conditions set up by the formation of a terrestrial planet and by the evolution of the host star's EUV and plasma environment are very important factors owing to which a planet may evolve to a habitable world. Finally we present a method for studying the discussed atmosphere evolution hypotheses by future UV transit observations of terrestrial exoplanets.

EUV observation from the Earth-orbiting satellite, EXCEED

NASA Astrophysics Data System (ADS)

Yoshioka, K.; Murakami, G.; Yoshikawa, I.; Ueno, M.; Uemizu, K.; Yamazaki, A.

2010-01-01

An Earth-orbiting small satellite “EXtreme ultraviolet spectrosCope for ExosphEric Dynamics” (EXCEED) which will be launched in 2012 is under development. The mission will carry out spectroscopic and imaging observation of EUV (Extreme Ultraviolet: 60-145 nm) emissions from tenuous plasmas around the planets (Venus, Mars, Mercury, and Jupiter). It is essential for EUV observation to put on an observing site outside the Earth’s atmosphere to avoid the absorption. It is also essential that the detection efficiency must be very high in order to catch the faint signals from those targets. In this mission, we employ cesium iodide coated microchannel plate as a 2 dimensional photon counting devise which shows 1.5-50 times higher quantum detection efficiency comparing with the bared one. We coat the surface of the grating and entrance mirror with silicon carbides by the chemical vapor deposition method in order to archive the high diffraction efficiency and reflectivity. The whole spectrometer is shielded by the 2 mm thick stainless steel to prevent the contamination caused by the high energy electrons from the inner radiation belt. In this paper, we will introduce the mission overview, its instrument, and their performance.

Nearly amorphous Mo-N gratings for ultimate resolution in extreme ultraviolet interference lithography.

PubMed

Wang, L; Kirk, E; Wäckerlin, C; Schneider, C W; Hojeij, M; Gobrecht, J; Ekinci, Y

2014-06-13

We present fabrication and characterization of high-resolution and nearly amorphous Mo1 - xNx transmission gratings and their use as masks for extreme ultraviolet (EUV) interference lithography. During sputter deposition of Mo, nitrogen is incorporated into the film by addition of N2 to the Ar sputter gas, leading to suppression of Mo grain growth and resulting in smooth and homogeneous thin films with a negligible grain size. The obtained Mo0.8N0.2 thin films, as determined by x-ray photoelectron spectroscopy, are characterized to be nearly amorphous using x-ray diffraction. We demonstrate a greatly reduced Mo0.8N0.2 grating line edge roughness compared with pure Mo grating structures after e-beam lithography and plasma dry etching. The amorphous Mo0.8N0.2 thin films retain, to a large extent, the benefits of Mo as a phase grating material for EUV wavelengths, providing great advantages for fabrication of highly efficient diffraction gratings with extremely low roughness. Using these grating masks, well-resolved dense lines down to 8 nm half-pitch are fabricated with EUV interference lithography.

Sigmoid CME Source Regions at the Sun: Some Recent Results

NASA Technical Reports Server (NTRS)

Sterling, Alphonse C.; Rose, M. Franklin (Technical Monitor)

2000-01-01

Identifying Coronal Mass Ejection (CME) precursors in the solar corona would be an important step in space weather forecasting, as well as a vital key to understanding the physics of CMEs. Twisted magnetic field structures are suspected of being the source of at least some CMEs. These features can appear sigmoid (S or inverse-S) shaped in soft X-ray (SXR) images. We review recent observations of these structures and their relation to CMEs, using soft X-ray (SXR) data from the Soft X-ray Telescope (SXT) on the Yohkoh satellite, and EUV data from the EUV Imaging Telescope (EIT) on the SOHO satellite. These observations indicate that the pre-eruption sigmoid patterns are more prominent in SXRs than in EUV, and that sigmoid precursors are present in over 50% of CMEs. These findings are important for CME research, and may potentially be a major component to space weather forecasting. So far, however, the studies have been subject to restrictions that will have to be relaxed before sigmoid morphology can be used as a reliable predictive tool. Moreover, some CMEs do not display a SXR sigmoid structure prior to eruption, and some others show no prominent SXR signature of any kind before or during eruption.

Sigmoid CME Source Regions at The Sun: Some Recent Results

NASA Technical Reports Server (NTRS)

Sterling, Alphonse C.

2000-01-01

Identifying coronal mass ejection (CME) precursors in the solar corona would be an important step in space weather forecasting, as well as a vital key to understanding the physics of CMEs. Twisted magnetic field structures are suspected of being the source of at least some CMEs. These features can appear sigmoid (S or inverse-S) shaped in soft X-ray, (SXR) images. We review recent observations of these structures and their relation to CMEs. using SXR data from the Soft X-ray Telescope (SXT) on the Yohkoh satellite, and EUV data from the EUV Imaging Telescope (EIT) on the SOHO satellite. These observations indicate that the pre-eruption sigmoid patterns are more prominent in SXRs than in EUV, and that sigmoid precursors are present in over 50% of CMEs. These findings are important for CME research, and may potentially be a major component to space weather forecasting. So far, however, the studies have been subject to restrictions that will have to be relaxed before sigmoid morphology can be used as a reliable predictive too[. Moreover, some CMEs do not display a SXR sigmoid structure prior to eruption, and some others show no prominent SXR signature of any kind before or during eruption.

Characterization of hot dense plasma with plasma parameters

NASA Astrophysics Data System (ADS)

Singh, Narendra; Goyal, Arun; Chaurasia, S.

2018-05-01

Characterization of hot dense plasma (HDP) with its parameters temperature, electron density, skin depth, plasma frequency is demonstrated in this work. The dependence of HDP parameters on temperature and electron density is discussed. The ratio of the intensities of spectral lines within HDP is calculated as a function of electron temperature. The condition of weakly coupled for HDP is verified by calculating coupling constant. Additionally, atomic data such as transition wavelength, excitation energies, line strength, etc. are obtained for Be-like ions on the basis of MCDHF method. In atomic data calculations configuration interaction and relativistic effects QED and Breit corrections are newly included for HDP characterization and this is first result of HDP parameters from extreme ultraviolet (EUV) radiations.

Plasma properties and magnetic field structure of the solar corona, based on coordinated Max 1991 observations from SERTS, the VLA, and magnetographs

NASA Technical Reports Server (NTRS)

Brosius, Jeffrey W.

1995-01-01

The purposes of this investigation are to use existing, calibrated, coaligned sets of coordinated multiwaveband observations of the Sun to determine the coronal magnetic field strength and structure, and interpret the collective observations in terms of a self-consistent model of the coronal plasma and magnetic field. This information is vital to understanding processes such as coronal heating, solar wind acceleration, pre-flare energy storage, and active region evolution. Understanding these processes is the central theme of Max '91, the NASA-supported series of solar observing campaigns under which the observations acquired for this work were obtained. The observations came from NASA/GSFC's Solar EUV Rocket Telescope and Spectrograph (SERTS), the Very Large Array (VLA), and magnetographs. The technique of calculating the coronal magnetic field is to establish the contributions to the microwave emission from the two main emission mechanisms: thermal bremsstrahlung and thermal gyroemission. This is done by using the EUV emission to determine values of the coronal plasma quantities needed to calculate the thermal bremsstrahlung contribution to the microwave emission. Once the microwave emission mechanism(s) are determined, the coronal magnetic field can be calculated. A comparison of the coronal magnetic field derived from the coordinated multiwaveband observations with extrapolations from photospheric magnetograms will provide insight into the nature of the coronal magnetic field.

Challenges of anamorphic high-NA lithography and mask making

NASA Astrophysics Data System (ADS)

Hsu, Stephen D.; Liu, Jingjing

2017-06-01

Chip makers are actively working on the adoption of 0.33 numerical aperture (NA) EUV scanners for the 7-nm and 5-nm nodes (B. Turko, S. L. Carson, A. Lio, T. Liang, M. Phillips, et al., in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 977602 (2016) doi: 10.1117/12.2225014; A. Lio, in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97760V (2016) doi: 10.1117/12.2225017). In the meantime, leading foundries and integrated device manufacturers are starting to investigate patterning options beyond the 5-nm node (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022). To minimize the cost and process complexity of multiple patterning beyond the 5-nm node, EUV high-NA single-exposure patterning is a preferred method over EUV double patterning (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022; J. van Schoot, K. van Ingen Schenau, G. Bottiglieri, K. Troost, J. Zimmerman, et al., `Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97761I (2016) doi: 10.1117/12.2220150). The EUV high-NA scanner equipped with a projection lens of 0.55 NA is designed to support resolutions below 10 nm. The high-NA system is beneficial for enhancing resolution, minimizing mask proximity correction bias, improving normalized image log slope (NILS), and controlling CD uniformity (CDU). However, increasing NA from 0.33 to 0.55 reduces the depth of focus (DOF) significantly. Therefore, the source mask optimization (SMO) with sub-resolution assist features (SRAFs) are needed to increase DOF to meet the demanding full chip process control requirements (S. Hsu, R. Howell, J. Jia, H.-Y. Liu, K. Gronlund, et al., EUV `Proc. SPIE9048, Extreme Ultraviolet (EUV) Lithography VI', (2015) doi: 10.1117/12.2086074). To ensure no assist feature printing, the assist feature sizes need to be scaled with λ/NA. The extremely small SRAF width (below 25 nm on the reticle) is difficult to fabricate across the full reticle. In this paper, we introduce an innovative `attenuated SRAF' to improve SRAF manufacturability and still maintain the process window benefit. A new mask fabrication process is proposed to use existing mask-making capability to manufacture the attenuated SRAFs. The high-NA EUV system utilizes anamorphic reduction; 4× in the horizontal (slit) direction and 8× in the vertical (scanning) direction (J. van Schoot, K. van Ingen Schenau, G. Bottiglieri, K. Troost, J. Zimmerman, et al., `Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97761I (2016) doi: 10.1117/12.2220150; B. Kneer, S. Migura, W. Kaiser, J. T. Neumann, J. van Schoot, in `Proc. SPIE9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94221G (2015) doi: 10.1117/12.2175488). For an anamorphic system, the magnification has an angular dependency, and thus, familiar mask specifications such as mask error factor (MEF) need to be redefined. Similarly, mask-manufacturing rule check (MRC) needs to consider feature orientation.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chilese, Francis C.; Torczynski, John R.; Garcia, Rudy

An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatusmore » may have A) a low pressure gas with a heat control unit thermally coupled to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween.« less

Prospect of space-based interferometry at EUV and soft X-ray wavelengths

NASA Technical Reports Server (NTRS)

Welsh, Barry Y.; Chakrabarti, Supriya

1992-01-01

We review the current capabilities of high-resolution, spectroscopic, space-borne instrumentation available for both solar and stellar observations in the EUV and soft X-ray wavelength regimes, and describe the basic design of a compact, all-reflection interferometer based on the spatial heterodyne technique; this is capable of producing a resolving power (lambda/Delta-lambda) of about 20,000 in the 100-200 A region using presently available multilayer optical components. Such an instrument can be readily constructed with existing technology. Due to its small size and lack of moving parts, it is ideally suited to spaceborne applications. Based on best estimates of the efficiency of this instrument at soft X-ray wavelengths, we review the possible use of this high-resolution interferometer in obtaining high-resolution full-disk spectroscopy of the sun. We also discuss its possible use for observations of diffuse sources such as the EUV interstellar background radiation.

Dual-domain lateral shearing interferometer

DOEpatents

Naulleau, Patrick P.; Goldberg, Kenneth Alan

2004-03-16

The phase-shifting point diffraction interferometer (PS/PDI) was developed to address the problem of at-wavelength metrology of extreme ultraviolet (EUV) optical systems. Although extremely accurate, the fact that the PS/PDI is limited to use with coherent EUV sources, such as undulator radiation, is a drawback for its widespread use. An alternative to the PS/PDI, with relaxed coherence requirements, is lateral shearing interferometry (LSI). The use of a cross-grating, carrier-frequency configuration to characterize a large-field 4.times.-reduction EUV lithography optic is demonstrated. The results obtained are directly compared with PS/PDI measurements. A defocused implementation of the lateral shearing interferometer in which an image-plane filter allows both phase-shifting and Fourier wavefront recovery. The two wavefront recovery methods can be combined in a dual-domain technique providing suppression of noise added by self-interference of high-frequency components in the test-optic wavefront.

Generation of coherent magnons in NiO stimulated by EUV pulses from a seeded free-electron laser

NASA Astrophysics Data System (ADS)

Simoncig, A.; Mincigrucci, R.; Principi, E.; Bencivenga, F.; Calvi, A.; Foglia, L.; Kurdi, G.; Matruglio, A.; Dal Zilio, S.; Masciotti, V.; Lazzarino, M.; Masciovecchio, C.

2017-12-01

The full comprehension of magnetic phenomena at the femtosecond (fs) time scale is of high demand for current material science and technology. Here we report the observation of coherent collective modes in the antiferromagnetic insulator nickel oxide (NiO) identified by a frequency of 0.86 THz, which matches the expected out-of-plane single-mode magnon resonance. Such collective excitations are inelastically stimulated by extreme ultraviolet (EUV) pulses delivered by a seeded free-electron laser (FEL) and subsequently revealed probing the transient optical activity of NiO looking at the Faraday effect. Moreover, the unique capability of the employed FEL source to deliver circularly polarized pulses allows us to demonstrate optomagnetic control of such collective modes at EUV photon energies. These results may set a starting point for future investigations of magnetic materials at time scales comparable or faster than those typical of exchange interactions.

DUV or EUV: that is the question

NASA Astrophysics Data System (ADS)

Williamson, David M.

2000-11-01

Lord Rayleigh's well-known equations for resolution and depth of focus indicate that resolution is better improved by reducing the wavelength of light rather than by increasing the numerical aperture (NA) of the projection optics, particularly when NA is approaching its physical limit of 1.0 in air (or vacuum). Vector aerial image simulations of diffraction-limited Deep Ultraviolet (DUV) and Extreme Ultraviolet (EUV) lithographic systems verify this simple view, even though Rayleigh's constants in Microlithography are not constant because of a variety of image enhancement techniques that attempt to compensate for the shortcomings of the aerial image when it is pushed to the limit. The aerial image is not the whole story, however. The competition between DUV and EUV systems will be decided more by economic and technological factors such as risk, time and cost of development and cost of ownership. These in turn depend on cost, availability and quality of light sources, refracting materials, photoresists and reticles.

Relationship between resist outgassing and EUV witness sample contamination in NXE outgas qualification using electrons and EUV photons

NASA Astrophysics Data System (ADS)

Pollentier, I.; Tirumala Venkata, A.; Gronheid, R.

2014-04-01

EUV photoresists are considered as a potential source of optics contamination, since they introduce irradiation-induced outgassing in the EUV vacuum environment. Therefore, before these resists can be used on e.g. ASML NXE:3100 or NXE:3300, they need to be tested in dedicated equipment according to a well-defined procedure, which is based on exposing a witness sample (WS) in the vicinity of a simultaneously exposed resist as it outgasses. Different system infrastructures are used at multiple sites (e.g. NIST, CNSE, Sematech, EIDEC, and imec) and were calibrated to each other by a detailed test plan. Despite this detailed tool qualifications, a first round robin comparison of identical materials showed inconsistent outgas test results, and required further investigation by a second round robin. Since the resist exposure mode is different at the various locations (some sites are using EUV photons while others use E-gun electrons), this difference has always a point of concern for variability of test results. In this work we compare the outgas test results from EUV photon and electron exposure using the resist materials of the second round robin. Since the imec outgas tester allows both exposure methods on the resist, a within-system comparison is possible and showed limited variation between photon and electron exposure mode. Therefore the system-to-system variability amongst the different outgas test sites is expected to be related to other parameters than the electron/photon exposure mode. Initial work showed that the variability might be related to temperature, E-gun emission excursion, and/or residual outgassing scaled by different wafer areas at the different sites.

Laboratory Studies in UV and EUV Solar Physics

NASA Technical Reports Server (NTRS)

Parkinson, William

2003-01-01

The Ion Beam Experiment at the Center for Astrophysics is dedicated to the study of ion-electron collision processes of importance in solar physics. A paper describing our most recent measurement 'Absolute cross section for Si(2+)(3s3p(sup 3)Rho (sup 0) yields 3s3p(sup 1)Rho(sup 0)) electron-impact excitation' was published during the past year. Dr. Paul Janzen received his PhD. from the Harvard Physics Department on the basis of this and other work, such as the new electron cyclotron resonance (ECR) ion source. The ion source is producing stable beams with large currents for our present work on C(2+), and it also produces stable beams with large currents of more highly charged systems, for future work on systems such as O(4+). The past year has been focussed on our current program to measure absolute cross sections for Electron Impact Excitation (EIE) in C(2+), one of the primary ions used for probing the solar transition region. C(2+) beams produced by the ion source have been transported to the interaction region of the experiment, where the collisions are studied, and Visiting Scientist Dr. Adrian Daw is currently collecting data to measure the C(2+)(2s2p(sup 3)Rho(sup 0) yields 2p(sup 2)(sup 3)Rho) EIE cross section as a function of collision energy, under the guidance of Drs. John Kohl, Larry Gardner and Bill Parkinson. Also this year, modifications were made to the ECR ion source in order to produce greater currents of highly charged ions. Testing of the ion source was completed. Modifications were designed to extend the photon detection capabilities of the apparatus to shorter UV wavelengths, or EUV. Following the work on C(2+)(2s2p(sup 3)Pho(sup 0) yields 2p(sup 2)(sup 3)Rho), the extended UV detection capabilities will be used to measure the C(2+)(2s(sup 2)(sup 1)S yields 2s2p(sup 1)Rho(sup 0)) EIE cross section. The EUV modifications complement those of the new ion source, by enabling detection of EUV light generated by high charge state ions and putting us in a position to measure the excitation cross sections for more highly charged ions as well.

Effect of plasma density around Io on local electron heating in the Io plasma torus

NASA Astrophysics Data System (ADS)

Tsuchiya, F.; Yoshioka, K.; Kagitani, M.; Kimura, T.; Murakami, G.; Yamazaki, A.; Misawa, H.; Kasaba, Y.; Yoshikawa, I.; Sakanoi, T.; Koga, R.; Ryo, A.; Suzuki, F.; Hikida, R.

2017-12-01

HISAKI observation of Io plasma torus (IPT) with extreme ultraviolet (EUV) wavelength range is a useful probe to access plasma environment in inner magnetosphere of Jupiter. Emissions from sulfur and oxygen ions in EUV range are caused by electron impact excitation and their intensity is well correlated with the abundance of hot electron in IPT. Previous observation showed that the brightness was enhanced downstream of the satellite Io, indicating that efficient electron heating takes place at Io and/or just downstream of Io. Detailed analysis of the emission intensity shows that the brightness depends on the magnetic longitude at Io and primary and secondary peaks appear in the longitude ranges of 100-130 and 250-340 degrees, respectively. The peak position and amplitude are slightly different between dawn and dusk sides. Here, we introduce inhomogeneous IPT density model in order to investigate relation between the emission intensity and local plasma density around Io in detail. An empirical IPT model is used for spatial distribution of ion and electron densities in the meridional plane. To include longitude and local time asymmetry in IPT, we consider (1)dawnward shift of IPT due to global convection electric field, (2) offset of Jupiter's dipole magnetic field, and (3) tilt of IPT with respect to Io's orbital plane. The modeled electron density at the position of Io as a function of magnetic longitude at Io shows similar profile with the ion emission intensity derived from the observation. This result suggests that energy extracted around Io and/or efficiency of electron heating is closely related to the plasma density around Io and longitude and local time dependences is explained by the spatial inhomogeneity of plasma density in IPT. A part of the energy extracted around Io could be transferred to the Jovian ionosphere along the magnetic field line and cause bright aurora spots and strong radio emissions.

A Sounding Rocket Mission Concept to Acquire High-Resolution Radiometric Spectra Spanning the 9 nm - 31 nm Wavelength Range

NASA Technical Reports Server (NTRS)

Krause, L. Habash; Cirtain, Jonathan; McGuirck, Michael; Pavelitz, Steven; Weber, Ed.; Winebarger, Amy

2012-01-01

When studying Solar Extreme Ultraviolet (EUV) emissions, both single-wavelength, two- dimensional (2D) spectroheliograms and multi-wavelength, one-dimensional (1D) line spectra are important, especially for a thorough understanding of the complex processes in the solar magnetized plasma from the base of the chromosphere through the corona. 2D image data are required for a detailed study of spatial structures, whereas radiometric (i.e., spectral) data provide information on relevant atomic excitation/ionization state densities (and thus temperature). Using both imaging and radiometric techniques, several satellite missions presently study solar dynamics in the EUV, including the Solar Dynamics Observatory (SDO), Hinode, and the Solar-Terrestrial Relations Observatory (STEREO). The EUV wavelengths of interest typically span 9 nm to 31 nm, with the shorter wavelengths being associated with the hottest features (e.g., intense flares and bright points) and the longer wavelengths associated with cooler features (e.g., coronal holes and filaments). Because the optical components of satellite instruments degrade over time, it is not uncommon to conduct sounding rocket underflights for calibration purposes. The authors have designed a radiometric sounding rocket payload that could serve as both a calibration underflight for and a complementary scientific mission to the upcoming Solar Ultraviolet Imager (SUVI) mission aboard the GOES-R satellite (scheduled for a 2015 launch). The challenge to provide quality radiometric line spectra over the 9-31 nm range covered by SUVI was driven by the multilayer coatings required to make the optical components, including mirrors and gratings, reflective over the entire range. Typically, these multilayers provide useful EUV reflectances over bandwidths of a few nm. Our solution to this problem was to employ a three-telescope system in which the optical components were coated with multilayers that spanned three wavelength ranges to cover the three pairs of SUVI bands. The complete system was designed to fit within the Black Brandt-IX 22.-diameter payload skin envelope. The basic optical path is that of a simple parabolic telescope in which EUV light is focused onto a slit and shutter assembly and imaged onto a normal-incidence diffraction grating, which then disperses the light onto a 2048 2048 CCD sensor. The CCD thus records 1D spatial information along one axis and spectral information along the other. The slit spans 40 arc-minutes in length, thus covering a solar diameter out to +/- 1.3 solar radii. Our operations concept includes imaging at three distinct positions: the north-south meridian, the northeast-southwest diagonal, and real-time pointing at an active region. Six 10-second images will be obtained at each position. Fine pointing is provided by the SPARCS-VII attitude control system typically employed on Black Brandt solar missions. Both before and after launch, all three telescopes will be calibrated with the EUV line emission source and monochromater system at NASA's Stray Light Facility at Marshall Spaceflight Center. Details of the payload design, operations concept, and data application will be presented.

Association of Impulsive Solar Energetic Particle Events With Large-Scale Coronal Waves

NASA Astrophysics Data System (ADS)

Bucik, R.; Innes, D.; Mason, G. M.; Wiedenbeck, M. E.

2016-12-01

Impulsive or 3He-rich solar energetic particle (SEP) events have been commonly associated with EUV jets and narrow CMEs which are believed to be the signatures of magnetic reconnection involving field lines open to interplanetary space. The elemental and isotopic fractionation in these events are thought to be caused by processes confined to the flare sites. In addition to their anomalous abundances, 3He-rich SEPs show puzzling energy spectral shapes varying from rounded forms to power laws where the later are characteristics of shock acceleration. In this study we identify 32 impulsive SEP events observed by the ACE near the Earth during the solar minimum period 2007-2010 and examine their solar sources with the high resolution STEREO EUV images. Leading the Earth, STEREO-A provided for the first time a direct view on impulsive SEP event sources, which are generally located on the Sun's western hemisphere. Surprisingly, we find that about half of the impulsive SEP events in this survey are associated with large-scale EUV coronal waves. An examination of the wave front propagation and the coronal magnetic field connections suggests that the EUV waves may affect the injection of 3He-rich SEPs into interplanetary space. We found the events with jets tend to be associated with rounded spectra and the events with coronal waves with power laws. This suggests that coronal waves may be related to the unknown second stage mechanism commonly used to interpret spectral forms of 3He-rich SEPs. R. Bucik is supported by the Deutsche Forschungsgemeinschaft under grant BU 3115/2-1.

High-radiance LDP source for mask inspection and beam line applications (Conference Presentation)

NASA Astrophysics Data System (ADS)

Teramoto, Yusuke; Santos, Bárbara; Mertens, Guido; Kops, Ralf; Kops, Margarete; von Wezyk, Alexander; Bergmann, Klaus; Yabuta, Hironobu; Nagano, Akihisa; Ashizawa, Noritaka; Taniguchi, Yuta; Yamatani, Daiki; Shirai, Takahiro; Kasama, Kunihiko

2017-04-01

High-throughput actinic mask inspection tools are needed as EUVL begins to enter into volume production phase. One of the key technologies to realize such inspection tools is a high-radiance EUV source of which radiance is supposed to be as high as 100 W/mm2/sr. Ushio is developing laser-assisted discharge-produced plasma (LDP) sources. Ushio's LDP source is able to provide sufficient radiance as well as cleanliness, stability and reliability. Radiance behind the debris mitigation system was confirmed to be 120 W/mm2/sr at 9 kHz and peak radiance at the plasma was increased to over 200 W/mm2/sr in the recent development which supports high-throughput, high-precision mask inspection in the current and future technology nodes. One of the unique features of Ushio's LDP source is cleanliness. Cleanliness evaluation using both grazing-incidence Ru mirrors and normal-incidence Mo/Si mirrors showed no considerable damage to the mirrors other than smooth sputtering of the surface at the pace of a few nm per Gpulse. In order to prove the system reliability, several long-term tests were performed. Data recorded during the tests was analyzed to assess two-dimensional radiance stability. In addition, several operating parameters were monitored to figure out which contributes to the radiance stability. The latest model that features a large opening angle was recently developed so that the tool can utilize a large number of debris-free photons behind the debris shield. The model was designed both for beam line application and high-throughput mask inspection application. At the time of publication, the first product is supposed to be in use at the customer site.

Plasmaspheric Plumes Observed by the CLUSTER and IMAGE Spacecraft

NASA Technical Reports Server (NTRS)

Fung, S. F.; Benson, R. F.; Garcia, L. N.; Adrian, M. L.; Sandel, B.; Goldstein, M. L.

2008-01-01

Global IMAGE/EUV observations have revealed complex changes in plasmaspheric structures as the plasmasphere responds to geomagnetic activity while remaining under varying degrees of influence by co-rotation, depending on the radial distance. The complex plasmaspheric dynamics, with different scales of variability, is clearly far from being well understood. There is now renewed interest in the plasmasphere due to its apparent connections with the development of the ring current and radiation belt, and loss of ionospheric plasmas. Early in the mission, the Cluster spacecraft only crossed the plasmapause (L - 4) occasionally and made measurements of the outer plasmasphere and plasmaspheric drainage plumes. The study by Darrouzet et al. [2006] provided detailed analyses of in situ Cluster observations and IMAGE EUV observations of three plasmaspheric plumes detected in April-June, 2002. Within the next couple of years, Cluster orbit will change, causing perigee to migrate to lower altitudes, and thus providing excellent opportunities to obtain more detailed measurements of the plasmasphere. In this paper, we report our analyses of the earlier Cluster-IMAGE events by incorporating the different perspectives provided by the IMAGE Radio Plasma Imager (RPI) observations. We will discuss our new understanding of the structure and dynamics of the Cluster-IMAGE events.

Surface modification of polymers for biocompatibility via exposure to extreme ultraviolet radiation.

PubMed

Inam Ul Ahad; Bartnik, Andrzej; Fiedorowicz, Henryk; Kostecki, Jerzy; Korczyc, Barbara; Ciach, Tomasz; Brabazon, Dermot

2014-09-01

Polymeric biomaterials are being widely used for the treatment of various traumata, diseases and defects in human beings due to ease in their synthesis. As biomaterials have direct interaction with the extracellular environment in the biological world, biocompatibility is a topic of great significance. The introduction or enhancement of biocompatibility in certain polymers is still a challenge to overcome. Polymer biocompatibility can be controlled by surface modification. Various physical and chemical methods (e.g., chemical and plasma treatment, ion implantation, and ultraviolet irradiation etc.) are in use or being developed for the modification of polymer surfaces. However an important limitation in their employment is the alteration of bulk material. Different surface and bulk properties of biomaterials are often desirable for biomedical applications. Because extreme ultraviolet (EUV) radiation penetration is quite limited even in low density mediums, it could be possible to use it for surface modification without influencing the bulk material. This article reviews the degree of biocompatibility of different polymeric biomaterials being currently employed in various biomedical applications, the surface properties required to be modified for biocompatibility control, plasma and laser ablation based surface modification techniques, and research studies indicating possible use of EUV for enhancing biocompatibility. © 2013 Wiley Periodicals, Inc.

Photoresist composition for extreme ultraviolet lithography

DOEpatents

Felter, T. E.; Kubiak, G. D.

1999-01-01

A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

SUMER: Solar Ultraviolet Measurements of Emitted Radiation

NASA Technical Reports Server (NTRS)

Wilhelm, K.; Axford, W. I.; Curdt, W.; Gabriel, A. H.; Grewing, M.; Huber, M. C. E.; Jordan, M. C. E.; Lemaire, P.; Marsch, E.; Poland, A. I.

1988-01-01

The SUMER (solar ultraviolet measurements of emitted radiation) experiment is described. It will study flows, turbulent motions, waves, temperatures and densities of the plasma in the upper atmosphere of the Sun. Structures and events associated with solar magnetic activity will be observed on various spatial and temporal scales. This will contribute to the understanding of coronal heating processes and the solar wind expansion. The instrument will take images of the Sun in EUV (extreme ultra violet) light with high resolution in space, wavelength and time. The spatial resolution and spectral resolving power of the instrument are described. Spectral shifts can be determined with subpixel accuracy. The wavelength range extends from 500 to 1600 angstroms. The integration time can be as short as one second. Line profiles, shifts and broadenings are studied. Ratios of temperature and density sensitive EUV emission lines are established.

Is the Linear Mode Conversion Theory Viable for Generating Kilometric Continuum?

NASA Technical Reports Server (NTRS)

Boardsen, Scott A.; Green, James L.; Hashimoto, K.; Gallagher, Dennis L.; Webb, P. A.

2006-01-01

Kilometric Continuum (KC) usually exhibits a complicated banded radiation pattern observed in frequency time spectrograms. Can the number of bands, the frequency range over which the bands are observed, and their time variation be explained with Linear Mode Conversion Theory (LMCT) using realistic plasmapause models and Extreme Ultraviolet (EUV) plasmaspheric observations? In this paper we compare KC observations with simulated frequency emission bands based on LMCT for a number of cases. In LMCT the allowed frequency range across the equatorial plasmapause is restricted to frequencies much greater than the electron cyclotron frequency (fce) and less than the maximum plasma frequency in this region. Fce also determines the number of allowed bands in this range. Is the observed frequency range and number of bands consistent with the predications of LMCT? Can irregularities in the shape of plasmaspheric structures like notches be observed in the time variations of KC emissions? We will investigate these and other questions. Simulated radiation patterns will be generated by ray tracing calculations in the L-O mode from the radio window at the near equatorial plasmapause. The KC observations used in this study are from the Plasma Wave Instrument on the Geotail spacecraft and from the Radio Plasma Imager on the IMAGE spacecraft. The plasmasphere and plasmapause will be derived either from plasmasphere simulations, from images by the EUV imager on the IMAGE spacecraft, and by using empirical models. In situ plasma density measurements from a number of spacecraft will also be used in order to reconstruct the plasmasphere for these case studies.

Evidence of the Dynamics of Relativistic Jet Launching in Quasars

NASA Astrophysics Data System (ADS)

Punsly, Brian

2015-06-01

Hubble Space Telescope (HST) spectra of the EUV, the optically thick emission from the innermost accretion flow onto the central supermassive black hole, indicate that radio loud quasars (RLQs) tend to be EUV weak compared to the radio-quiet quasars; yet the remainder of the optically thick thermal continuum is indistinguishable. The deficit of EUV emission in RLQs has a straightforward interpretation as a missing or a suppressed innermost region of local energy dissipation in the accretion flow. This article is an examination of the evidence for a distribution of magnetic flux tubes in the innermost accretion flow that results in magnetically arrested accretion (MAA) and creates the EUV deficit. These same flux tubes and possibly the interior magnetic flux that they encircle are the sources of the jet power as well. In the MAA scenario, islands of large-scale vertical magnetic flux perforate the innermost accretion flow of RLQs. The first prediction of the theory that is supported by the HST data is that the strength of the (large-scale poloidal magnetic fields) jets in the MAA region is regulated by the ram pressure of the accretion flow in the quasar environment. The second prediction that is supported by the HST data is that the rotating magnetic islands remove energy from the accretion flow as a Poynting flux dominated jet in proportion to the square of the fraction of the EUV emitting gas that is displaced by these islands.

Imaging Magnetospheric Perturbations of the Ionosphere/Plasmasphere System from the Ground and Space

NASA Astrophysics Data System (ADS)

Foster, J. C.

2004-05-01

The thermal plasmas of the inner magnetosphere and ionosphere move across the magnetic field under the influence of electric fields. Irrespective of their source, these electric fields extend along magnetic field lines coupling the motion of thermal plasmas in the various altitude regimes. Modern remote-sensing techniques based both on the ground and in space are providing a new view of the large and meso-scale characteristics and dynamics of the plasmas of the extended ionosphere and their importance in understanding processes and effects observed throughout the coupled spheres of Earth's upper atmosphere. During strong geomagnetic storms, disturbance electric fields uplift and redistribute the thermal plasma of the low-latitude ionosphere and inner magnetosphere, producing a pronounced poleward shift of the equatorial anomalies (EA) and enhancements of plasma concentration (total electric content, TEC) in the post-noon plasmasphere. Strong SAPS (subauroral polarization stream) electric fields erode the plasmasphere boundary layer in the region of the dusk-sector bulge, producing plasmaspheric drainage plumes which carry the high-altitude material towards the dayside magnetopause. The near-Earth footprint of these flux tubes constitutes the mid-latitude streams of storm-enhanced density (SED) which produce considerable space weather effects across the North American continent. We use ground-based GPS propagation data to produce two-dimensional maps and movies of the evolution of these TEC features as they progress from equatorial regions to the polar caps. DMSP satellite overflights provide in-situ density and plasma flow/electric field observations, while the array of incoherent scatter radars probe the altitude distribution and characteristics of these dynamic thermal plasma features. IMAGE EUV and FUV observations reveal the space-based view of spatial extent and temporal evolution of these phenomena.

Coronal Physics and the Chandra Emission Line Project

NASA Technical Reports Server (NTRS)

Brickhouse, N. S.; Drake, J. J.

2000-01-01

With the launch of the Chandra X-ray Observatory, high resolution X-ray spectroscopy of cosmic sources has begun. Early, deep observations of three stellar coronal sources Capella, Procyon, and HR 1099 are providing not only invaluable calibration data, but also benchmarks for plasma spectral models. These models are needed to interpret data from stellar coronae, galaxies and clusters of galaxies, supernova, remnants and other astrophysical sources. They have been called into question in recent years as problems with understanding low resolution ASCA and moderate resolution Extreme Ultraviolet Explorer Satellite (EUVE) data have arisen. The Emission Line Project is a collaborative effort, to improve the models, with Phase I being the comparison of models with observed spectra of Capella, Procyon, and HR 1099. Goals of these comparisons are (1) to determine and verify accurate and robust diagnostics and (2) to identify and prioritize issues in fundamental spectroscopy which will require further theoretical and/or laboratory work. A critical issue in exploiting the coronal data for these purposes is to understand the extent, to which common simplifying assumptions (coronal equilibrium, negligible optical depth) apply. We will discuss recent, advances in our understanding of stellar coronae, in this context.

Coronal Physics and the Chandra Emission Line Project

NASA Technical Reports Server (NTRS)

Brickhouse, Nancy

1999-01-01

With the launch of the Chandra X-ray Observatory, high resolution X-ray spectroscopy of cosmic sources has begun. Early, deep observations of three stellar coronal sources will provide not only invaluable calibration data, but will also give us benchmarks for plasma spectral modeling codes. These codes are to interpret data from stellar coronae, galaxies and clusters of galaxies. supernova remnants and other astrophysical sources, but they have been called into question in recent years as problems with understanding moderate resolution ASCA and EUVE data have arisen. The Emission Line Project is a collaborative effort to improve the models, with Phase 1 being the comparison of models with observed spectra of Capella, Procyon, and HR, 1099. Goals of these comparisons are (1) to determine and verify accurate and robust diagnostics and (2) to identify and prioritize issues in fundamental spectroscopy which will require further theoretical and/or laboratory work. A critical issue in exploiting the coronal data for these purposes is to understand the extent to which common simplifying assumptions (coronal equilibrium, time-independence, negligible optical depth) apply. We will discuss recent advances in our understanding of stellar coronae in this context.

Gibbsian segregating alloys driven by thermal and concentration gradients: A potential grazing collector optics used in EUV lithography

NASA Astrophysics Data System (ADS)

Qiu, Huatan

A critical issue for EUV lithography is the minimization of collector degradation from intense plasma erosion and debris deposition. Reflectivity and lifetime of the collector optics will be heavily dependent on surface chemistry interactions between fuels and various mirror materials, in addition to high-energy ion and neutral particle erosion effects. An innovative Gibbsian segregation (GS) concept has been developed for being a self-healing, erosion-resistant collector optics. A Mo-Au GS alloy is developed on silicon using a DC dual-magnetron co-sputtering system in order for enhanced surface roughness properties, erosion resistance, and self-healing characteristics to maintain reflectivity over a longer period of mirror lifetime. A thin Au segregating layer will be maintained through segregation during exposure, even though overall erosion is taking place. The reflective material, Mo, underneath the segregating layer will be protected by this sacrificial layer which is lost due to preferential sputtering. The two dominant driving forces, thermal (temperature) and surface concentration gradient (surface removal flux), are the focus of this work. Both theoretical and experimental efforts have been performed to prove the effectiveness of the GS alloy used as EUV collection optics, and to elucidate the underlying physics behind it. The segregation diffusion, surface balance, erosion, and in-situ reflectivity will be investigated both qualitatively and quantitatively. Results show strong enhancement effect of temperature on GS performance, while only a weak effect of surface removal rate on GS performance. When equilibrium between GS and erosion is reached, the surface smoothness could be self-healed and reflectivity could be maintained at an equilibrium level, instead of continuously dropping down to an unacceptable level as conventional optic mirrors behave. GS process also shows good erosion resistance. The effectiveness of GS alloy as EUV mirror is dependent on the temperature and surface removal rate. The Mo-Au GS alloy could be effective at elevated temperature as the potential grazing mirror as EUV collector optics.

THE FORMATION AND EARLY EVOLUTION OF A CORONAL MASS EJECTION AND ITS ASSOCIATED SHOCK WAVE ON 2014 JANUARY 8

DOE Office of Scientific and Technical Information (OSTI.GOV)

Wan Linfeng; Cheng, Xin; Shi, Tong

2016-08-01

In this paper, we study the formation and early evolution of a limb coronal mass ejection (CME) and its associated shock wave that occurred on 2014 January 8. The extreme ultraviolet (EUV) images provided by the Atmospheric Imaging Assembly (AIA) on board the Solar Dynamics Observatory disclose that the CME first appears as a bubble-like structure. Subsequently, its expansion forms the CME and causes a quasi-circular EUV wave. Interestingly, both the CME and the wave front are clearly visible at all of the AIA EUV passbands. Through a detailed kinematical analysis, it is found that the expansion of the CMEmore » undergoes two phases: a first phase with a strong but transient lateral over-expansion followed by a second phase with a self-similar expansion. The temporal evolution of the expansion velocity coincides very well with the variation of the 25–50 keV hard X-ray flux of the associated flare, which indicates that magnetic reconnection most likely plays an important role in driving the expansion. Moreover, we find that, when the velocity of the CME reaches ∼600 km s{sup −1}, the EUV wave starts to evolve into a shock wave, which is evidenced by the appearance of a type II radio burst. The shock’s formation height is estimated to be ∼0.2 R {sub sun}, which is much lower than the height derived previously. Finally, we also study the thermal properties of the CME and the EUV wave. We find that the plasma in the CME leading front and the wave front has a temperature of ∼2 MK, while that in the CME core region and the flare region has a much higher temperature of ≥8 MK.« less

Invited Article: Progress in coherent lithography using table-top extreme ultraviolet lasers

NASA Astrophysics Data System (ADS)

Li, W.; Urbanski, L.; Marconi, M. C.

2015-12-01

Compact (table top) lasers emitting at wavelengths below 50 nm had expanded the spectrum of applications in the extreme ultraviolet (EUV). Among them, the high-flux, highly coherent laser sources enabled lithographic approaches with distinctive characteristics. In this review, we will describe the implementation of a compact EUV lithography system capable of printing features with sub-50 nm resolution using Talbot imaging. This compact system is capable of producing consistent defect-free samples in a reliable and effective manner. Examples of different patterns and structures fabricated with this method will be presented.

Development status of EUV sources for use in beta-tools and high-volume chip manufacturing tools

NASA Astrophysics Data System (ADS)

Stamm, U.; Kleinschmidt, J.; Bolshukhin, D.; Brudermann, J.; Hergenhan, G.; Korobotchko, V.; Nikolaus, B.; Schürmann, M. C.; Schriever, G.; Ziener, C.; Borisov, V. M.

2006-03-01

In the paper we give an update about the development status of gas discharge produced plasma (GDPP) EUV sources at XTREME technologies. Already in 2003 first commercial prototypes of xenon GDPP sources of the type XTS 13-35 based on the Z-pinch with 35 W power in 2π sr have been delivered and integrated into micro-exposure tools from Exitech, UK. The micro-exposure tools with these sources have been installed in industry in 2004. The first tool has made more than 100 million pulses without visible degradation of the source collector optics. For the next generation of full-field exposure tools (we call it Beta-tools) we develop GDPP sources with power of > 10 W in intermediate focus. Also these sources use xenon as fuel which has the advantage of not introducing additional contaminations. Here we describe basic performance of these sources as well as aspects of collector integration and debris mitigation and optics lifetime. To achieve source performance data required for high volume chip manufacturing we consider tin as fuel for the source because of its higher conversion efficiency compared to xenon. While we had earlier reported an output power of 400 W in 2π sr from a tin source we could reach meanwhile 800 W in 2π sr from the source in burst operation. Provided a high power collector is available with a realistic collector module efficiency of between 9% and 15 % these data would support 70-120 W power in intermediate focus. However, we do not expect that the required duty cycle and the required electrode lifetimes can be met with this standing electrode design Z-pinch approach. To overcome lifetime and duty cycle limitations we have investigated GDPP sources with tin fuel and rotating disk electrodes. Currently we can generate more than 200 W in 2π sr with these sources at 4 kHz repetition rate. To achieve 180 W power in intermediate focus which is the recent requirement of some exposure tool manufacturers this type of source needs to operate at 21-28 kHz repetition rate which may be not possible by various reasons. In order to make operation at reasonable repetition rates with sufficient power possible we have investigated various new excitation concepts of the rotating disk electrode configurations. With one of the concepts pulse energies above 170 mJ in 2π sr could be demonstrated. This approach promises to support 180 W intermediate focus power at repetition rates in the range between 7 and 10 kHz. It will be developed to the next power level in the following phase of XTREME technologies' high volume manufacturing source development program.

Effect of SPM-based cleaning POR on EUV mask performance

NASA Astrophysics Data System (ADS)

Choi, Jaehyuck; Lee, Han-shin; Yoon, Jinsang; Shimomura, Takeya; Friz, Alex; Montgomery, Cecilia; Ma, Andy; Goodwin, Frank; Kang, Daehyuk; Chung, Paul; Shin, Inkyun; Cho, H.

2011-11-01

EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality and patterning performance can change during mask fabrication, EUV exposure, maintenance cleaning, shipping, or storage. The fact that a pellicle is not used to protect the mask surface in EUV lithography suggests that EUV masks may have to undergo more cleaning cycles during their lifetime. More frequent cleaning, combined with the adoption of new materials for EUV masks, necessitates that mask manufacturers closely examine the performance change of EUV masks during cleaning process. We have investigated EUV mask quality and patterning performance during 30 cycles of Samsung's EUV mask SPM-based cleaning and 20 cycles of SEMATECH ADT exposure. We have observed that the quality and patterning performance of EUV masks does not significantly change during these processes except mask pattern CD change. To resolve this issue, we have developed an acid-free cleaning POR and substantially improved EUV mask film loss compared to the SPM-based cleaning POR.

Film loss-free cleaning chemicals for EUV mask lifetime elongation developed through combinatorial chemical screening

NASA Astrophysics Data System (ADS)

Choi, Jaehyuck; Kim, Jinsu; Lowe, Jeff; Dattilo, Davide; Koh, Soowan; Choi, Jun Yeol; Dietze, Uwe; Shoki, Tsutomu; Kim, Byung Gook; Jeon, Chan-Uk

2015-10-01

EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality and patterning performance can change during mask fabrication, EUV exposure, maintenance cleaning, shipping, or storage. SPM (Sulfuric acid peroxide mixture) which has been extensively used for acid cleaning of photomask and wafer has serious drawback for EUV mask cleaning. It shows severe film loss of tantalum-based absorber layers and limited removal efficiency of EUV-generated carbon contaminants on EUV mask surface. Here, we introduce such novel cleaning chemicals developed for EUV mask as almost film loss free for various layers of the mask and superior carbon removal performance. Combinatorial chemical screening methods allowed us to screen several hundred combinations of various chemistries and additives under several different process conditions of temperature and time, eventually leading to development of the best chemistry selections for EUV mask cleaning. Recently, there have been many activities for the development of EUV pellicle, driven by ASML and core EUV scanner customer companies. It is still important to obtain film-loss free cleaning chemicals because cleaning cycle of EUV mask should be much faster than that of optic mask mainly due to EUV pellicle lifetime. More frequent cleaning, combined with the adoption of new materials for EUV masks, necessitates that mask manufacturers closely examine the performance change of EUV masks during cleaning process. We have investigated EUV mask quality changes and film losses during 50 cleaning cycles using new chemicals as well as particle and carbon contaminant removal characteristics. We have observed that the performance of new chemicals developed is superior to current SPM or relevant cleaning chemicals for EUV mask cleaning and EUV mask lifetime elongation.

Evidence of solar wind energy deposition into the ionosphere of Mars

NASA Technical Reports Server (NTRS)

Mantas, G. P.; Hanson, W. B.

1985-01-01

Suprathermal electron fluxes measured in the ionosphere of Mars by the retarding potential analyzer (RPA) on Viking lander 1 are presented and compared with the photoelectron flux that is produced by the absorption of the solar EUV. The calculation of the equilibrium photoelectron population on Mars is based on the multistream electron transport theory and a model neutral atmosphere and ionosphere that was actually observed by Viking lander 1. From the theoretical equilibrium photoelectron population, the expected RPA volt-ampere characteristic curves are computed and compared with those recorded by the instrument. The theoretical and the observed RPA currents below about 170 km are in agreement, confirming that the solar EUV is the main source of suprathermal electrons at these altitudes. Above about 170 km an additional source of suprathermal electrons is required to explain the observations.

EUV multilayer mirrors with enhanced stability

NASA Astrophysics Data System (ADS)

Benoit, Nicolas; Yulin, Sergiy; Feigl, Torsten; Kaiser, Norbert

2006-08-01

The application of multilayer optics in EUV lithography requires not only the highest possible normal-incidence reflectivity but also a long-term thermal and radiation stability at operating temperatures. This requirement is most important in the case of the collector mirror of the illumination system close to the EUV source where a short-time decrease in reflectivity is most likely. Mo/Si multilayer mirrors, designed for high normal reflectivity at the wavelength of 13.5 nm and deposited by dc magnetron sputtering, were directly exposed to EUV radiation without mitigation system. They presented a loss of reflectivity of more than 18% after only 8 hours of irradiation by a Xe-discharge source. Another problem of Mo/Si multilayers is the instability of reflectivity and peak wavelength under high heat load. It becomes especially critical at temperatures above 200°C, where interdiffusion between the molybdenum and the silicon layers is observed. The development of high-temperature multilayers was focused on two alternative Si-based systems: MoSi II/Si and interface engineered Mo/C/Si/C multilayer mirrors. The multilayer designs as well as the deposition parameters of all systems were optimized in terms of high peak reflectivity (>= 60 %) at a wavelength of 13.5 nm and high thermal stability. Small thermally induced changes of the MoSi II/Si multilayer properties were found but they were independent of the annealing time at all temperatures examined. A wavelength shift of -1.7% and a reflectivity drop of 1.0% have been found after annealing at 500°C for 100 hours. The total degradation of optical properties above 650°C can be explained by a recrystallization process of MoSi II layers.

The First ALMA Observation of a Solar Plasmoid Ejection from an X-Ray Bright Point

DOE Office of Scientific and Technical Information (OSTI.GOV)

Shimojo, Masumi; Hudson, Hugh S.; White, Stephen M.

2017-05-20

Eruptive phenomena such as plasmoid ejections or jets are important features of solar activity and have the potential to improve our understanding of the dynamics of the solar atmosphere. Such ejections are often thought to be signatures of the outflows expected in regions of fast magnetic reconnection. The 304 Å EUV line of helium, formed at around 10{sup 5} K, is found to be a reliable tracer of such phenomena, but the determination of physical parameters from such observations is not straightforward. We have observed a plasmoid ejection from an X-ray bright point simultaneously at millimeter wavelengths with ALMA, atmore » EUV wavelengths with SDO /AIA, and in soft X-rays with Hinode /XRT. This paper reports the physical parameters of the plasmoid obtained by combining the radio, EUV, and X-ray data. As a result, we conclude that the plasmoid can consist either of (approximately) isothermal ∼10{sup 5} K plasma that is optically thin at 100 GHz, or a ∼10{sup 4} K core with a hot envelope. The analysis demonstrates the value of the additional temperature and density constraints that ALMA provides, and future science observations with ALMA will be able to match the spatial resolution of space-borne and other high-resolution telescopes.« less

The development and test of a deformable diffraction grating for a stigmatic EUV spectroheliometer

NASA Technical Reports Server (NTRS)

Timothy, J. Gethyn; Walker, A. B. C., Jr.; Morgan, J. S.; Huber, M. C. E.; Tondello, G.

1992-01-01

The objectives were to address currently unanswered fundamental questions concerning the fine scale structure of the chromosphere, transition region, and corona. The unique characteristics of the spectroheliometer was used in combination with plasma diagnostic techniques to study the temperature, density, and velocity structures of specific features in the solar outer atmosphere. A unified understanding was sought of the interplay between the time dependent geometry of the magnetic field structure and the associated flows of mass and energy, the key to which lies in the smallest spatial scales that are unobservable with current EUV instruments. Toroidal diffraction gratings were fabricated and tested by a new technique using an elastically deformable substrate. The toroidal diffraction gratings was procured and tested to be used for the evaluation of the Multi-Anode Microchannel Array (MAMA) detector systems for the Solar Ultraviolet Measurements of Emitted Radiation (SUMER) and UV Coronagraph Spectrometer (UVCS) instruments on the SOHO mission.

Prominence Mass Supply and the Cavity

NASA Technical Reports Server (NTRS)

Schmit, Donald J.; Gibson, S.; Luna, M.; Karpen, J.; Innes, D.

2013-01-01

A prevalent but untested paradigm is often used to describe the prominence-cavity system; the cavity is under-dense because it it evacuated by supplying mass to the condensed prominence. The thermal non-equilibrium (TNE) model of prominence formation offers a theoretical framework to predict the thermodynamic evolutin of the prominence and the surrounding corona. We examine the evidence for a prominence-cavity connection by comparing the TNE model and diagnostics of dynamic extreme ultraviolet (EUV) emission surrounding the prominence, specifically prominence horns. Horns are correlated extensions of prminence plasma and coronal plasma which appear to connect the prominence and cavity. The TNE model predicts that large-scale brightenings will occur in the Solar Dynamics Observatory Atmospheric Imaging Assembly 171 A badpass near he prominence that are associated with the cooling phase of condensation formation. In our simulations, variations in the magnitude of footpoint heating lead to variations in the duration, spatial scale, and temporal offset between emission enhancements in the other EUV bandpasses. While these predictions match well a subset of the horn observations, the range of variations in the observed structures is not captured by the model. We discuss the implications of one-dimensional loop simulations for the three-dimensional time-averaged equilibrium in the prominence and the cavity. Evidence suggests that horns are likely caused by condensing prominence plasma, but the larger question of whether this process produces a density-depleted cavity requires a more tightly constrained model of heating and better knowledge of the associated magnetic structure.

Results from a new 193nm die-to-database reticle inspection platform

NASA Astrophysics Data System (ADS)

Broadbent, William H.; Alles, David S.; Giusti, Michael T.; Kvamme, Damon F.; Shi, Rui-fang; Sousa, Weston L.; Walsh, Robert; Xiong, Yalin

2010-05-01

A new 193nm wavelength high resolution reticle defect inspection platform has been developed for both die-to-database and die-to-die inspection modes. In its initial configuration, this innovative platform has been designed to meet the reticle qualification requirements of the IC industry for the 22nm logic and 3xhp memory generations (and shrinks) with planned extensions to the next generation. The 22nm/3xhp IC generation includes advanced 193nm optical lithography using conventional RET, advanced computational lithography, and double patterning. Further, EUV pilot line lithography is beginning. This advanced 193nm inspection platform has world-class performance and the capability to meet these diverse needs in optical and EUV lithography. The architecture of the new 193nm inspection platform is described. Die-to-database inspection results are shown on a variety of reticles from industry sources; these reticles include standard programmed defect test reticles, as well as advanced optical and EUV product and product-like reticles. Results show high sensitivity and low false and nuisance detections on complex optical reticle designs and small feature size EUV reticles. A direct comparison with the existing industry standard 257nm wavelength inspection system shows measurable sensitivity improvement for small feature sizes

Association of 3He-rich solar energetic particles with large-scale coronal waves

NASA Astrophysics Data System (ADS)

Bucik, Radoslav; Innes, Davina; Guo, Lijia; Mason, Glenn M.; Wiedenbeck, Mark

2016-07-01

Impulsive or 3He-rich solar energetic particle (SEP) events have been typically associated with jets or small EUV brightenings. We identify 30 impulsive SEP events from ACE at L1 during the solar minimum period 2007-2010 and examine their solar sources with high resolution STEREO-A EUV images. At beginning of 2007, STEREO-A was near the Earth while at the end of the investigated period, when there were more events, STEREO-A was leading the Earth by 90°. Thus STEREO-A provided a better (more direct) view on 3He-rich flares generally located on the western Sun's hemisphere. Surprisingly, we find that about half of the events are associated with large-scale EUV coronal waves. This finding provides new insights on acceleration and transport of 3He-rich SEPs in solar corona. It is believed that elemental and isotopic fractionation in impulsive SEP events is caused by more localized processes operating in the flare sites. The EUV waves have been reported in gradual SEP events in association with fast coronal mass ejections. To examine their role on 3He-rich SEPs production the energy spectra and relative abundances are discussed. R. Bucik is supported by the Deutsche Forschungsgemeinschaft under grant BU 3115/2-1.

PLASMOID EJECTIONS AND LOOP CONTRACTIONS IN AN ERUPTIVE M7.7 SOLAR FLARE: EVIDENCE OF PARTICLE ACCELERATION AND HEATING IN MAGNETIC RECONNECTION OUTFLOWS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Liu Wei; Chen Qingrong; Petrosian, Vahe

2013-04-20

Where particle acceleration and plasma heating take place in relation to magnetic reconnection is a fundamental question for solar flares. We report analysis of an M7.7 flare on 2012 July 19 observed by SDO/AIA and RHESSI. Bi-directional outflows in forms of plasmoid ejections and contracting cusp-shaped loops originate between an erupting flux rope and underlying flare loops at speeds of typically 200-300 km s{sup -1} up to 1050 km s{sup -1}. These outflows are associated with spatially separated double coronal X-ray sources with centroid separation decreasing with energy. The highest temperature is located near the nonthermal X-ray loop-top source wellmore » below the original heights of contracting cusps near the inferred reconnection site. These observations suggest that the primary loci of particle acceleration and plasma heating are in the reconnection outflow regions, rather than the reconnection site itself. In addition, there is an initial ascent of the X-ray and EUV loop-top source prior to its recently recognized descent, which we ascribe to the interplay among multiple processes including the upward development of reconnection and the downward contractions of reconnected loops. The impulsive phase onset is delayed by 10 minutes from the start of the descent, but coincides with the rapid speed increases of the upward plasmoids, the individual loop shrinkages, and the overall loop-top descent, suggestive of an intimate relation of the energy release rate and reconnection outflow speed.« less

Low density of neutral hydrogen and helium in the local interstellar medium: Extreme Ultraviolet Explorer photometry of the Lyman continuum of the hot white dwarfs MCT 0501-2858, MCT 0455-2812, HZ 43, and GD 153

NASA Technical Reports Server (NTRS)

Vennes, Stephane; Dupuis, Jean; Bowyer, Stuart; Fontaine, Gilles; Wiercigroch, Alexandria; Jelinsky, Patrick; Wesemael, Francois; Malina, Roger

1994-01-01

The first comprehensive sky survey of the extreme ultraviolet (EUV) spectral range performed by the Extreme Ultraviolet Explorer (EUVE) has uncovered a handful of very bright sources at wavelengths longer than the He I 504 A photoionization edge. Among these objects are four white dwarfs with exceptionally low interstellar medium (ISM) column densities along the line of sight. Analysis of EUV photometry of the He-rich DO white dwarf MCT 0501-2858 and the H-rich DA white dwarf MCT 0455-2812 along one line of sight and of the DA white dwarfs HZ 43 and GD 153 near the north Galactic pole indicates that the overall minimum column density of the neutral material centered on the Sun is N(H I) = 0.5-1.0 x 10(exp 18)/sq cm. In the case of MCT 0501-2858, EUV photometric measurements provide a clear constraint to the effective temperature (60,000-70,000 K). Given these neutral hydrogen columns, the actual contribution to the density of neutral species from the immediate solar environment (the 'local fluff') would only cover a distance of approximately equals 2-3 pc (assuming an average density n(H I) = 0.1/cu cm) leaving these lines of sight almost entirely within the hot phase of the ISM. A preliminary examination of the complete EUVE long-wavelength survey indicates that these lines of sight are exceptional and set a minimum column density in the solar environment.

X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography; Proceedings of the Meeting, San Diego, CA, July 9-13, 1990

NASA Technical Reports Server (NTRS)

Hoover, Richard B. (Editor); Walker, Arthur B. C., Jr. (Editor)

1991-01-01

Topics discussed in this issue include the fabrication of multilayer X-ray/EUV coatings; the design, characterization, and test of multilayer X-ray/EUV coatings; multilayer X-ray/EUV monochromators and imaging microscopes; X-ray/EUV telescopes; the test and calibration performance of X-ray/EUV instruments; XUV/soft X-ray projection lithography; X-ray/EUV space observatories and missions; X-ray/EUV telescopes for solar research; X-ray/EUV polarimetry; X-ray/EUV spectrographs; and X-ray/EUV filters and gratings. Papers are presented on the deposition-controlled uniformity of multilayer mirrors, interfaces in Mo/Si multilayers, the design and analysis of an aspherical multilayer imaging X-ray microscope, recent developments in the production of thin X-ray reflecting foils, and the ultraprecise scanning technology. Consideration is also given to an active sun telescope array, the fabrication and performance at 1.33 nm of a 0.24-micron-period multilayer grating, a cylindrical proportional counter for X-ray polarimetry, and the design and analysis of the reflection grating arrays for the X-Ray Multi-Mirror Mission.

Modeling of thermomechanical changes of extreme-ultraviolet mask and their dependence on absorber variation

NASA Astrophysics Data System (ADS)

Ban, Chung-Hyun; Park, Eun-Sang; Park, Jae-Hun; Oh, Hye-Keun

2018-06-01

Thermal and structural deformation of extreme-ultraviolet lithography (EUVL) masks during the exposure process may become important issues as these masks are subject to rigorous image placement and flatness requirements. The reflective masks used for EUVL absorb energy during exposure, and the temperature of the masks rises as a result. This can cause thermomechanical deformation that can reduce the pattern quality. The use of very thick low-thermal-expansion substrate materials (LTEMs) may reduce energy absorption, but they do not completely eliminate mask deformation. Therefore, it is necessary to predict and optimize the effects of energy transferred from the extreme-ultraviolet (EUV) light source and the resultant patterns of structured EUV masks with complex multilayers. Our study shows that heat accumulates in the masks as exposure progresses. It has been found that a higher absorber ratio (pattern density) applied to the patterning of EUV masks exacerbates the problem, especially in masks with more complex patterns.

Towards a complete caracterisation of Ganymede's environnement

NASA Astrophysics Data System (ADS)

Cessateur, Gaël; Barthélémy, Mathieu; Lilensten, Jean; Dudok de Wit, Thierry; Kretzschmar, Matthieu; Mbemba Kabuiku, Lydie

2013-04-01

In the framework to the JUICE mission to the Jovian system, a complete picture of the interaction between Ganymede's atmosphere and external forcing is needed. This will definitely allow us to constrain instrument performances according to the mission objectives. The main source of information regarding the upper atmosphere is the non LTE UV-Visible-near IR emissions. Those emissions are both induce by the incident solar UV flux and particle precipitations. This work aims at characterizing the impact from those external forcing, and then at deriving some key physical parameters that are measurable by an orbiter, namely the oxygen red line at 630 nm or the resonant oxygen line at 130 nm for example. We will also present the 4S4J instrument, a proposed EUV radiometer, which will provides the solar local EUV flux, an invaluable parameter for the JUICE mission. Based on new technologies and a new design, only two passbands are considered for reconstructing the whole EUV spectrum.

RE 1016-053 - A pre-cataclysmic binary, and the first extreme ultraviolet and X-ray detections of a DAO white dwarf

NASA Technical Reports Server (NTRS)

Tweedy, R. W.; Holberg, J. B.; Barstow, M. A.; Bergeron, P.; Grauer, A. D.; Liebert, James; Fleming, T. A.

1993-01-01

Photometric observations and analysis of the optical, UV, EUV, and X-ray spectra are presented for the EUV/X-ray source RE 1016-53. Multiwavelength observations of RE 1016-53 point out that it is a precataclysmic binary. Optical spectra exhibit the steep blue continuum and Balmer absorption typical of a hot white dwarf, but there are bright, narrow emission lines of H I, He I, and Ca II superimposed on this. The white dwarf component, with T (eff) = 55,800 +/- 1000 K and log g = 7.81 +/- 0.007, dominates the spectrum from the optical to the EUV/X-ray. An He II 4686 A absorption line suggests that the white dwarf is a hydrogen-helium (DAO) hybrid star. Four of the five precataclysmic binaries with white dwarfs with T(eff) greater than 40,000 K appear to be DAOs. A mass of 0.57 +/- 0.003 solar mass has been derived.

Conductance Effects on Inner Magnetospheric Plasma Morphology: Model Comparisons with IMAGE EUV, MENA, and HENA Data

NASA Technical Reports Server (NTRS)

Liemohn, M.; Ridley, A. J.; Kozyra, J. U.; Gallagher, D. L.; Brandt, P. C.; Henderson, M. G.; Denton, M. H.; Jahn, J. M.; Roelof, E. C.; DeMajistre, R. M.

2004-01-01

Modeling results of the inner magnetosphere showing the influence of the ionospheric conductance on the inner magnetospheric electric fields during the April 17, 2002 magnetic storm are presented. Kinetic plasma transport code results are analyzed in combination with observations of the inner magnetospheric plasma populations, in particular those from the IMAGE satellite. Qualitative and quantitative comparisons are made with the observations from EW, MENA, and HENA, covering the entire energy range simulated by the model (0 to 300 keV). The electric field description, and in particular the ionospheric conductance, is the only variable between the simulations. Results from the data-model comparisons are discussed, detailing the strengths and weaknesses of each conductance choice for each energy channel.

Excitation of flare-induced waves in coronal loops and the effects of radiative cooling

NASA Astrophysics Data System (ADS)

Provornikova, Elena; Ofman, Leon; Wang, Tongjiang

2018-01-01

EUV imaging observations from several space missions (SOHO/EIT, TRACE, and SDO/AIA) have revealed a presence of propagating intensity disturbances in solar coronal loops. These disturbances are typically interpreted as slow magnetoacoustic waves. However, recent spectroscopic observations with Hinode/EIS of active region loops revealed that the propagating intensity disturbances are associated with intermittent plasma upflows (or jets) at the footpoints which are presumably generated by magnetic reconnection. For this reason, whether these disturbances are waves or periodic flows is still being studied. This study is aimed at understanding the physical properties of observed disturbances by investigating the excitation of waves by hot plasma injections from below and the evolution of flows and wave propagation along the loop. We expand our previous studies based on isothermal 3D MHD models of an active region to a more realistic model that includes full energy equation accounting for the effects of radiative losses. Computations are initialized with an equilibrium state of a model active region using potential (dipole) magnetic field, gravitationally stratified density and temperature obtained from the polytropic equation of state. We model an impulsive injection of hot plasma into the steady plasma outflow along the loops of different temperatures, warm (∼1 MK) and hot (∼6 MK). The simulations show that hot jets launched at the coronal base excite slow magnetoacoustic waves that propagate to high altitudes along the loops, while the injected hot flows decelerate rapidly with heights. Our results support that propagating disturbances observed in EUV are mainly the wave features. We also find that the effect of radiative cooling on the damping of slow-mode waves in 1-6 MK coronal loops is small, in agreement with the previous conclusion based on 1D MHD models.

Responses of Solar Irradiance and the Ionosphere to an Intense Activity Region

NASA Astrophysics Data System (ADS)

Chen, Yiding; Liu, Libo; Le, Huijun; Wan, Weixing

2018-03-01

Solar rotation (SR) variation dominates solar extremely ultraviolet (EUV) changes on the timescale of days. The F10.7 index is usually used as an indicator for solar EUV. The SR variation of F10.7 significantly enhanced during the 2008th-2009th Carrington rotations (CRs) owing to an intense active region; F10.7 increased about 180 units during that SR period. That was the most prominent SR variation of F10.7 during solar cycle 23. In this paper, global electron content (GEC) is used to investigate ionospheric response to that strong variation of solar irradiance indicated by F10.7. The variation of GEC with F10.7 was anomalous (GEC-F10.7 slope significantly decreased) during the 2008th-2009th CRs; however, GEC versus EUV variation during that period was consistent with that during adjacent time intervals when using Solar Heliospheric Observatory/Solar EUV Monitor 26-34 nm EUV measurements. The reason is that F10.7 response to that intense active region was much stronger than EUV response; thus, the EUV-F10.7 slope decreased. We confirmed decreased EUV-F10.7 slope during the 2008th-2009th CRs for different wavelengths within 27-120 nm using Thermosphere, Ionosphere, Mesosphere Energetics and Dynamics/Solar EUV Experiment high spectral resolution EUV measurements. And on the basis of Solar Heliospheric Observatory/Solar EUV Monitor EUV measurements during solar cycle 23, we further presented that EUV-F10.7 slope statistically tends to decrease when the SR variation of F10.7 significantly enhances. Moreover, we found that ionospheric time lag effect to EUV is exaggerated when using F10.7, owing to the time lag effect of EUV to F10.7.

Determination of Differential Emission Measure from Solar Extreme Ultraviolet Images

NASA Astrophysics Data System (ADS)

Su, Yang; Veronig, Astrid M.; Hannah, Iain G.; Cheung, Mark C. M.; Dennis, Brian R.; Holman, Gordon D.; Gan, Weiqun; Li, Youping

2018-03-01

The Atmospheric Imaging Assembly (AIA) on board the Solar Dynamic Observatory (SDO) has been providing high-cadence, high-resolution, full-disk UV-visible/extreme ultraviolet (EUV) images since 2010, with the best time coverage among all the solar missions. A number of codes have been developed to extract plasma differential emission measures (DEMs) from AIA images. Although widely used, they cannot effectively constrain the DEM at flaring temperatures with AIA data alone. This often results in much higher X-ray fluxes than observed. One way to solve the problem is by adding more constraint from other data sets (such as soft X-ray images and fluxes). However, the spatial information of plasma DEMs are lost in many cases. In this Letter, we present a different approach to constrain the DEMs. We tested the sparse inversion code and show that the default settings reproduce X-ray fluxes that could be too high. Based on the tests with both simulated and observed AIA data, we provided recommended settings of basis functions and tolerances. The new DEM solutions derived from AIA images alone are much more consistent with (thermal) X-ray observations, and provide valuable information by mapping the thermal plasma from ∼0.3 to ∼30 MK. Such improvement is a key step in understanding the nature of individual X-ray sources, and particularly important for studies of flare initiation.

Signatures of Slow Solar Wind Streams from Active Regions in the Inner Corona

NASA Astrophysics Data System (ADS)

Slemzin, V.; Harra, L.; Urnov, A.; Kuzin, S.; Goryaev, F.; Berghmans, D.

2013-08-01

The identification of solar-wind sources is an important question in solar physics. The existing solar-wind models ( e.g., the Wang-Sheeley-Arge model) provide the approximate locations of the solar wind sources based on magnetic field extrapolations. It has been suggested recently that plasma outflows observed at the edges of active regions may be a source of the slow solar wind. To explore this we analyze an isolated active region (AR) adjacent to small coronal hole (CH) in July/August 2009. On 1 August, Hinode/EUV Imaging Spectrometer observations showed two compact outflow regions in the corona. Coronal rays were observed above the active-region coronal hole (ARCH) region on the eastern limb on 31 July by STEREO-A/EUVI and at the western limb on 7 August by CORONAS- Photon/TESIS telescopes. In both cases the coronal rays were co-aligned with open magnetic-field lines given by the potential field source surface model, which expanded into the streamer. The solar-wind parameters measured by STEREO-B, ACE, Wind, and STEREO-A confirmed the identification of the ARCH as a source region of the slow solar wind. The results of the study support the suggestion that coronal rays can represent signatures of outflows from ARs propagating in the inner corona along open field lines into the heliosphere.

The Io plasma torus during the Cassini encounter with Jupiter: Temporal, radial and azimuthal variations

NASA Astrophysics Data System (ADS)

Steffl, Andrew Joseph

During the Cassini spacecraft's flyby of Jupiter (1 October 2000 to 31 March 2001), the Ultraviolet Imaging Spectrograph (UVIS) produced an extensive dataset consisting of several thousand spectrally-dispersed images of the lo plasma torus. The temporal, radial, and azimuthal variability of the to plasma torus during this period are examined. The total EUV power radiated from the torus is found to be ~1.7 x 10 12 W with variations of 25%. Several events were observed during which the torus brightened by 20% over a few hours. Significant changes in the composition of the torus plasma were observed between 1 October 2000 and 11 November 2000. The composition and electron temperature of the torus plasma as a function of radial distance were derived from a scale of the midnight sector of the torus. The radial profile during the Cassini epoch shows significant differences from the Voyager era. The Io torus is found to exhibit significant azimuthal variations in ion composition. This compositional variation is observed to have a period of 10.07 hours 1.5% longer than the System III rotation period of Jupiter. While exhibiting many similar characteristics, the periodicity in the UVIS data is 1.3% shorter than the "System IV" period. The amplitude of the azimuthal variation of S II and S IV varies between 5-25% during the observing period, while the amplitude of the variation of S III and O II remains in the range of 2-5%. The amplitude of the azimuthal compositional asymmetry appears to be modulated by its location in System III longitude. The observed temporal variability is reproduced by models of the torus chemistry that include a factor of 3 increase in the rate of oxygen and sulfur atoms supplied to the extended neutral clouds that are the source of the torus plasma coupled with a ~35% increase in the amount of riot electrons in the Io torus. The observed azimuthal variability of the Io torus is well matched by models incorporating a primary source of hot electrons that slips 12.2°/day relative to the System III coordinate system and a secondary source of hot electrons that remains fixed in System III.

CONSTRAINING SOLAR FLARE DIFFERENTIAL EMISSION MEASURES WITH EVE AND RHESSI

DOE Office of Scientific and Technical Information (OSTI.GOV)

Caspi, Amir; McTiernan, James M.; Warren, Harry P.

2014-06-20

Deriving a well-constrained differential emission measure (DEM) distribution for solar flares has historically been difficult, primarily because no single instrument is sensitive to the full range of coronal temperatures observed in flares, from ≲2 to ≳50 MK. We present a new technique, combining extreme ultraviolet (EUV) spectra from the EUV Variability Experiment (EVE) onboard the Solar Dynamics Observatory with X-ray spectra from the Reuven Ramaty High Energy Solar Spectroscopic Imager (RHESSI), to derive, for the first time, a self-consistent, well-constrained DEM for jointly observed solar flares. EVE is sensitive to ∼2-25 MK thermal plasma emission, and RHESSI to ≳10 MK; together, the twomore » instruments cover the full range of flare coronal plasma temperatures. We have validated the new technique on artificial test data, and apply it to two X-class flares from solar cycle 24 to determine the flare DEM and its temporal evolution; the constraints on the thermal emission derived from the EVE data also constrain the low energy cutoff of the non-thermal electrons, a crucial parameter for flare energetics. The DEM analysis can also be used to predict the soft X-ray flux in the poorly observed ∼0.4-5 nm range, with important applications for geospace science.« less

Heating of an Erupting Prominence Associated with a Solar Coronal Mass Ejection on 2012 January 27

DOE Office of Scientific and Technical Information (OSTI.GOV)

Lee, Jin-Yi; Moon, Yong-Jae; Kim, Kap-Sung

2017-07-20

We investigate the heating of an erupting prominence and loops associated with a coronal mass ejection and X-class flare. The prominence is seen as absorption in EUV at the beginning of its eruption. Later, the prominence changes to emission, which indicates heating of the erupting plasma. We find the densities of the erupting prominence using the absorption properties of hydrogen and helium in different passbands. We estimate the temperatures and densities of the erupting prominence and loops seen as emission features using the differential emission measure method, which uses both EUV and X-ray observations from the Atmospheric Imaging Assembly onmore » board the Solar Dynamics Observatory and the X-ray Telescope on board Hinode . We consider synthetic spectra using both photospheric and coronal abundances in these calculations. We verify the methods for the estimation of temperatures and densities for the erupting plasmas. Then, we estimate the thermal, kinetic, radiative loss, thermal conduction, and heating energies of the erupting prominence and loops. We find that the heating of the erupting prominence and loop occurs strongly at early times in the eruption. This event shows a writhing motion of the erupting prominence, which may indicate a hot flux rope heated by thermal energy release during magnetic reconnection.« less

Thermal energy creation and transport and X-ray/EUV emission in a thermodynamic MHD CME simulation

NASA Astrophysics Data System (ADS)

Reeves, K.; Mikic, Z.; Torok, T.; Linker, J.; Murphy, N. A.

2017-12-01

We model a CME using the PSI 3D numerical MHD code that includes coronal heating, thermal conduction and radiative cooling in the energy equation. The magnetic flux distribution at 1 Rs is produced by a localized subsurface dipole superimposed on a global dipole field, mimicking the presence of an active region within the global corona. We introduce transverse electric fields near the neutral line in the active region to form a flux rope, then a converging flow is imposed that causes the eruption. We follow the formation and evolution of the current sheet and find that instabilities set in soon after the reconnection commences. We simulate XRT and AIA EUV emission and find that the instabilities manifest as bright features emanating from the reconnection region. We examine the quantities responsible for plasma heating and cooling during the eruption, including thermal conduction, radiation, adiabatic compression and expansion, coronal heating and ohmic heating due to dissipation of currents. We find that the adiabatic compression plays an important role in heating the plasma around the current sheet, especially in the later stages of the eruption when the instabilities are present. Thermal conduction also plays an important role in the transport of thermal energy away from the current sheet region throughout the reconnection process.

Near-threshold harmonics from a femtosecond enhancement cavity-based EUV source: effects of multiple quantum pathways on spatial profile and yield.

PubMed

Hammond, T J; Mills, Arthur K; Jones, David J

2011-12-05

We investigate the photon flux and far-field spatial profiles for near-threshold harmonics produced with a 66 MHz femtosecond enhancement cavity-based EUV source operating in the tight-focus regime. The effects of multiple quantum pathways in the far-field spatial profile and harmonic yield show a strong dependence on gas jet dynamics, particularly nozzle diameter and position. This simple system, consisting of only a 700 mW Ti:Sapphire oscillator and an enhancement cavity produces harmonics up to 20 eV with an estimated 30-100 μW of power (intracavity) and > 1μW (measured) of power spectrally-resolved and out-coupled from the cavity. While this power is already suitable for applications, a quantum mechanical model of the system indicates substantial improvements should be possible with technical upgrades.

Quality control of EUVE databases

NASA Technical Reports Server (NTRS)

John, L. M.; Drake, J.

1992-01-01

The publicly accessible databases for the Extreme Ultraviolet Explorer include: the EUVE Archive mailserver; the CEA ftp site; the EUVE Guest Observer Mailserver; and the Astronomical Data System node. The EUVE Performance Assurance team is responsible for verifying that these public EUVE databases are working properly, and that the public availability of EUVE data contained therein does not infringe any data rights which may have been assigned. In this poster, we describe the Quality Assurance (QA) procedures we have developed from the approach of QA as a service organization, thus reflecting the overall EUVE philosophy of Quality Assurance integrated into normal operating procedures, rather than imposed as an external, post facto, control mechanism.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Szulagyi, Judit; Pascucci, Ilaria; Abraham, Peter

Mid-infrared atomic and ionic line ratios measured in spectra of pre-main-sequence stars are sensitive indicators of the hardness of the radiation field impinging on the disk surface. We present a low-resolution Spitzer IRS search for [Ar II] at 6.98 {mu}m, [Ne II] at 12.81 {mu}m, and [Ne III] 15.55 {mu}m lines in 56 transitional disks. These objects, characterized by reduced near-infrared but strong far-infrared excess emission, are ideal targets to set constraints on the stellar radiation field onto the disk, because their spectra are not contaminated by shock emission from jets/outflows or by molecular emission lines. After demonstrating that wemore » can detect [Ne II] lines and recover their fluxes from the low-resolution spectra, here we report the first detections of [Ar II] lines toward protoplanetary disks. We did not detect [Ne III] emission in any of our sources. Our [Ne II]/[Ne III] line flux ratios combined with literature data suggest that a soft-EUV or X-ray spectrum produces these gas lines. Furthermore, the [Ar II]/[Ne II] line flux ratios point to a soft X-ray and/or soft-EUV stellar spectrum as the ionization source of the [Ar II] and [Ne II] emitting layer of the disk. If the soft X-ray component dominates over the EUV, then we would expect larger photoevaporation rates and, hence, a reduction of the time available to form planets.« less

AN IMAGING STUDY OF A COMPLEX SOLAR CORONAL RADIO ERUPTION

DOE Office of Scientific and Technical Information (OSTI.GOV)

Feng, S. W.; Chen, Y.; Song, H. Q.

2016-08-10

Solar coronal radio bursts are enhanced radio emission excited by energetic electrons accelerated during solar eruptions. Studying these bursts is important for investigating the origin and physical mechanism of energetic particles and further diagnosing coronal parameters. Earlier studies suffered from a lack of simultaneous high-quality imaging data of the radio burst and the eruptive structure in the inner corona. Here we present a study on a complex solar radio eruption consisting of a type II burst and three reversely drifting type III bursts, using simultaneous EUV and radio imaging data. It is found that the type II burst is closelymore » associated with a propagating and evolving CME-driven EUV shock structure, originated initially at the northern shock flank and later transferred to the top part of the shock. This source transfer is coincident with the presence of shock decay and enhancing signatures observed at the corresponding side of the EUV front. The electron energy accelerated by the shock at the flank is estimated to be ∼0.3 c by examining the imaging data of the fast-drifting herringbone structure of the type II burst. The reverse-drifting type III sources are found to be within the ejecta and correlated with a likely reconnection event therein. The implications for further observational studies and relevant space weather forecasting techniques are discussed.« less

A new storage-ring light source

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chao, Alex

2015-06-01

A recently proposed technique in storage ring accelerators is applied to provide potential high-power sources of photon radiation. The technique is based on the steady-state microbunching (SSMB) mechanism. As examples of this application, one may consider a high-power DUV photon source for research in atomic and molecular physics or a high-power EUV radiation source for industrial lithography. A less challenging proof-of-principle test to produce IR radiation using an existing storage ring is also considered.

Detection of Propagating Fast Sausage Waves through a Detailed Analysis of a Zebra Pattern Fine Structure in a Solar Radio Burst

NASA Astrophysics Data System (ADS)

Kaneda, K.; Misawa, H.; Iwai, K.; Masuda, S.; Tsuchiya, F.; Katoh, Y.; Obara, T.

2017-12-01

Recent observations have revealed that various modes of magnetohydrodynamic (MHD) waves are ubiquitous in the corona. In imaging observations in EUV, propagating fast magnetoacoustic waves are difficult to observe due to the lack of time resolution. Quasi-periodic modulation of radio fine structures is an important source of information on these MHD waves. Zebra patterns (ZPs) are one of such fine structures in type IV bursts, which consist of several parallel stripes superimposed on the background continuum. Although the generation mechanism of ZPs has been discussed still, the most favorable model of ZPs is so-called double plasma resonance (DPR) model. In the DPR model, the frequency separation between the adjacent stripes (Δf) is determined by the plasma density and magnetic field in their source. Hence, the variation of Δf in time and frequency represents the disturbance in their source region in the corona. We report the detection of propagating fast sausage waves through the analysis of a ZP event on 2011 June 21. The variation of Δf in time and frequency was obtained using highly resolved spectral data from the Assembly of Metric-band Aperture Telescope and Real-time Analysis System (AMATERAS). We found that Δf increases with the increase of emission frequency as a whole, which is consistent with the DPR model. Furthermore, we also found that irregularities in Δf are repetitively drifting from the high frequency side to the low frequency side. Their frequency drift rate was 3 - 8 MHz/s and the repetitive frequency was several seconds. Assuming the ZP generation by the DPR model, the drifting irregularities in Δf correspond to propagating disturbances in plasma density and magnetic field with speeds of 3000 - 8000 km/s. Taking account of these facts, the observed modulations in Δf can be explained by fast sausage waves propagating through the corona. We will also discuss the plasma conditions in the corona estimated from the observational results.

Energetic (above 60 eV) atmospheric photoelectrons

NASA Technical Reports Server (NTRS)

Winningham, J. D.; Decker, D. T.; Kozyra, J. U.; Nagy, A. F.; Jasperse, J. R.

1989-01-01

Data from low altitude plasma instrument (LAPI) on Dynamics Explorer 2 document a population of high-energy (up to 800 eV) atmospheric photoelectrons that has not been reported in the published literature. The source of these photoelectrons is postulated to be the soft X-ray portion of the whole sun spectrum. This conclusion is supported by sunrise-sunset characteristics that track those of the classical (below 60 eV) EUV-produced photoelectrons, and theoretical results from two models that incorporate the soft X-ray portion of the solar spectrum. The models include K-shell ionization effects and predict peaks in the photoelectron spectrum due to Auger electrons emitted from oxygen and nitrogen. The peak for nitrogen is observed as predicted, but the peak for oxygen is barely observable. Excellent quantitative agreement is achieved between theory and experiment by using reasonable adjustments to the few published soft X-ray spectra based on solar activity. The upflowing energetic photoelectrons provide a heretofore unknown source of electrons to the magnetosphere. They occur whenever and wherever the sun is up, that is, at all invariant latitudes. Their density is low, but they are steady and ubiquitous. If scattering and trapping occur on closed field lines, then photoelectrons could contribute as a significant particle source and thus represent a new facet of magnetosphere-ionosphere coupling.

Kelvin-Helmholtz instability in an active region jet observed with Hinode

NASA Astrophysics Data System (ADS)

Zhelyazkov, I.; Chandra, R.; Srivastava, A. K.

2016-02-01

Over past ten years a variety of jet-like phenomena were detected in the solar atmosphere, including plasma ejections over a range of coronal temperatures being observed as extreme ultraviolet (EUV) and X-ray jets. We study the possibility for the development of Kelvin-Helmholtz (KH) instability of transverse magnetohydrodynamic (MHD) waves traveling along an EUV jet situated on the west side of NOAA AR 10938 and observed by three instruments on board Hinode on 2007 January 15/16 (Chifor et al. in Astron. Astrophys. 481:L57, 2008b). The jet was observed around log Te = 6.2 with up-flow velocities exceeded 150 km s^{-1}. Using Fe xii λ186 and λ195 line ratios, the measured densities were found to be above log Ne = 11. We have modeled that EUV jet as a vertically moving magnetic flux tube (untwisted and weakly twisted) and have studied the propagation characteristics of the kink (m = 1) mode and the higher m modes with azimuthal mode numbers m = 2, 3, 4. It turns out that all these MHD waves can become unstable at flow velocities in the range of 112-114.8 km s^{-1}. The lowest critical jet velocity of 112 km s^{-1} is obtained when modeling the jet as compressible plasma contained in an untwisted magnetic flux tube. When the jet and its environments are treated as incompressible media, the critical jet velocity becomes higher, namely 114.8 km s^{-1}. A weak twist of the equilibrium magnetic field in the same approximation of incompressible plasmas slightly decreases the threshold Alfvén Mach number, MA^{cr}, and consequently the corresponding critical velocities, notably to 114.4 km s^{-1} for the kink mode and to 112.4 km s^{-1} for the higher m modes. We have also compared two analytically found criteria for predicting the threshold Alfvén Mach number for the onset of KH instability and have concluded that one of them yields reliable values for MA^{cr}. Our study of the nature of stable and unstable MHD modes propagating on the jet shows that in a stable regime all the modes are pure surface waves, while the unstable kink (m = 1) mode in untwisted compressible plasma flux tube becomes a leaky wave. In the limit of incompressible media (for the jet and its environment) all unstable modes are non-leaky surface waves.

Analysis of a Failed Eclipse Plasma Ejection Using EUV Observations

NASA Astrophysics Data System (ADS)

Tavabi, E.; Koutchmy, S.; Bazin, C.

2018-03-01

The photometry of eclipse white-light (W-L) images showing a moving blob is interpreted for the first time together with observations from space with the PRoject for On Board Autonomy (PROBA-2) mission (ESA). An off-limb event seen with great details in W-L was analyzed with the SWAP imager ( Sun Watcher using Active pixel system detector and image Processing) working in the EUV near 174 Å. It is an elongated plasma blob structure of 25 Mm diameter moving above the east limb with coronal loops under. Summed and co-aligned SWAP images are evaluated using a 20-h sequence, in addition to the 11 July, 2010 eclipse W-L images taken from several sites. The Atmospheric Imaging Assembly (AIA) instrument on board the Solar Dynamics Observatory (SDO) recorded the event suggesting a magnetic reconnection near a high neutral point; accordingly, we also call it a magnetic plasmoid. The measured proper motion of the blob shows a velocity up to 12 km s^{-1}. Electron densities of the isolated condensation (cloud or blob or plasmoid) are photometrically evaluated. The typical value is 108 cm^{-3} at r=1.7 R_{⊙}, superposed on a background corona of 107 cm^{-3} density. The mass of the cloud near its maximum brightness is found to be 1.6×10^{13} g, which is typically 0.6×10^{-4} of the overall mass of the corona. From the extrapolated magnetic field the cloud evolves inside a rather broad open region but decelerates, after reaching its maximum brightness. The influence of such small events for supplying material to the ubiquitous slow wind is noticed. A precise evaluation of the EUV photometric data, after accurately removing the stray light, suggests an interpretation of the weak 174 Å radiation of the cloud as due to resonance scattering in the Fe IX/X lines.

Imaging Thermal He(+)in Geospace from the Lunar Surface

NASA Technical Reports Server (NTRS)

Gallagher, D. L.; Sandel, B. R.; Adrian, Mark L.; Goldstein, Jerry; Jahn, Joerg-Micha; Spasojevic, Maria; Griffin, Brand

2007-01-01

By mass, thermal plasma dominates near-earth space and strongly influences the transport of energy and mass into the earth's atmosphere. It is proposed to play an important role in modifying the strength of space weather storms by its presence in regions of magnetic reconnection in the dayside magnetopause and in the near to mid-magnetotail. Ionospheric-origin thermal plasma also represents the most significant potential loss of atmospheric mass from our planet over geological time. Knowledge of the loss of convected thermal plasma into the solar wind versus its recirculation across high latitudes and through the magnetospheric flanks into the magnetospheric tail will enable determination of the mass balance for this mass-dominant component of the Geospace system and of its influence on global magnetospheric processes that are critical to space weather prediction and hence to the impact of space processes on human technology in space and on Earth. Our proposed concept addresses this basic issue of Geospace dynamics by imaging thermal He(+) ions in extreme ultraviolet light with an instrument on the lunar surface. The concept is derived from the highly successful Extreme Ultraviolet imager (EUV) flown on the Imager for Magnetopause-to-Aurora Global Exploration (IMAGE) spacecraft. From the lunar surface an advanced EUV imager is anticipated to have much higher sensitivity, lower background noise, and higher communication bandwidth back to Earth. From the near-magnetic equatorial location on the lunar surface, such an imager would be ideally located to follow thermal He(+) ions to high latitudes, into the magnetospheric flanks, and into the magnetotail.

The Extreme Ultraviolet Explorer mission

NASA Technical Reports Server (NTRS)

Malina, R. F.; Battel, S. J.

1989-01-01

The Extreme Ultraviolet Explorer (EUVE) mission will be the first user of NASA's new Explorer platform. The instrumentation included on this mission consists of three grazing incidence scanning telescopes, a deep survey instrument and an EUV spectrometer. The bandpass covered is 80 to 900 A. During the first six months of the mission, the scanning telescopes will be used to make all-sky maps in four bandpasses; astronomical sources wil be detected and their positions determined to an accuracy of 0.1 deg. The deep survey instrument will survey the sky with higher sensitivity along the ecliptic in two bandpasses between 80 and 500 A. Engineering and design aspects of the science payload and features of the instrument design are described.

Performance evaluation of nonchemically amplified negative tone photoresists for e-beam and EUV lithography

NASA Astrophysics Data System (ADS)

Singh, Vikram; Satyanarayana, Vardhineedi Sri Venkata; Batina, Nikola; Reyes, Israel Morales; Sharma, Satinder K.; Kessler, Felipe; Scheffer, Francine R.; Weibel, Daniel E.; Ghosh, Subrata; Gonsalves, Kenneth E.

2014-10-01

Although extreme ultraviolet (EUV) lithography is being considered as one of the most promising next-generation lithography techniques for patterning sub-20 nm features, the development of suitable EUV resists remains one of the main challenges confronting the semiconductor industry. The goal is to achieve sub-20 nm line patterns having low line edge roughness (LER) of <1.8 nm and a sensitivity of 5 to 20 mJ/cm2. The present work demonstrates the lithographic performance of two nonchemically amplified (n-CARs) negative photoresists, MAPDST homopolymer and MAPDST-MMA copolymer, prepared from suitable monomers containing the radiation sensitive sulfonium functionality. Investigations into the effect of several process parameters are reported. These include spinning conditions to obtain film thicknesses <50 nm, baking regimes, exposure conditions, and the resulting surface topographies. The effect of these protocols on sensitivity, contrast, and resolution has been assessed for the optimization of 20 nm features and the corresponding LER/line width roughness. These n-CARs have also been found to possess high etch resistance. The etch durability of MAPDST homopolymer and MAPDST-MMA copolymer (under SF6 plasma chemistry) with respect to the silicon substrate are 7.2∶1 and 8.3∶1, respectively. This methodical investigation will provide guidance in designing new resist materials with improved efficiency for EUVL through polymer microstructure engineering.

Effects of different drivers on ion fluxes at Mars. MARS EXPRESS and MAVEN observations

NASA Astrophysics Data System (ADS)

Dubinin, Eduard; Fraenz, Markus; McFadden, James; Halekas, Jasper; Epavier, Frank; Connerney, Jack; Brain, David; Jakosky, Bruce; Andrews, David; Barabash, Stas

2017-04-01

Recent observations by Mars Express and MAVEN spacecraft have shown that the Martian atmosphere/ionosphere is exposed to the impact of solar wind which results in losses of volatiles from Mars. This erosion is an important factor for the evolution of the Martian atmosphere and its water inventory. To estimate the escape forced by the solar wind during the early Solar System conditions we need to know how the ionosphere of Mars and escape fluxes depend on variations in the strength of the external drivers, in particularly, of solar wind and solar EUV flux. We present multi-instrument observations of the influence of the solar wind and solar irradiance on the Martian ionosphere and escape fluxes. We use data obtained by the ASPERA-3 and MARSIS experiments on Mars Express and by the STATIC, SWIA, MAG and EUV monitor on MAVEN. Observations by Mars Express supplemented by the EUV monitoring at Earth orbit and translated to Mars orbit provide us information about this dependence over more than 10 years whereas the measurements made by MAVEN provide us for the first time the opportunity to study these processes with simultaneous monitoring of the solar wind and ionospheric variations, planetary ion fluxes and solar irradiance. It will be shown that that fluxes of planetary ions through different escape channels (trans-terminator fluxes, ion plume, plasma sheet) respond differently on the variations of the different drivers.

Measuring Velocities in the Early Stage of an Eruption: Using “Overlappogram” Data from Hinode EIS

NASA Astrophysics Data System (ADS)

Harra, Louise K.; Hara, Hirohisa; Doschek, George A.; Matthews, Sarah; Warren, Harry; Culhane, J. Leonard; Woods, Magnus M.

2017-06-01

In order to understand the onset phase of a solar eruption, plasma parameter measurements in the early phases are key to constraining models. There are two current instrument types that allow us to make such measurements: narrow-band imagers and spectrometers. In the former case, even narrow-band filters contain multiple emission lines, creating some temperature confusion. With imagers, however, rapid cadences are achievable and the field of view can be large. Velocities of the erupting structures can be measured by feature tracking. In the spectrometer case, slit spectrometers can provide spectrally pure images by “rastering” the slit to build up an image. This method provides limited temporal resolution, but the plasma parameters can be accurately measured, including velocities along the line of sight. Both methods have benefits and are often used in tandem. In this paper we demonstrate for the first time that data from the wide slot on the Hinode EUV Imaging Spectrometer, along with imaging data from AIA, can be used to deconvolve velocity information at the start of an eruption, providing line-of-sight velocities across an extended field of view. Using He II 256 Å slot data at flare onset, we observe broadening or shift(s) of the emission line of up to ±280 km s-1. These are seen at different locations—the redshifted plasma is seen where the hard X-ray source is later seen (energy deposition site). In addition, blueshifted plasma shows the very early onset of the fast rise of the filament.

Measuring Velocities in the Early Stage of an Eruption: Using “Overlappogram” Data from Hinode EIS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Harra, Louise K.; Matthews, Sarah; Culhane, J. Leonard

In order to understand the onset phase of a solar eruption, plasma parameter measurements in the early phases are key to constraining models. There are two current instrument types that allow us to make such measurements: narrow-band imagers and spectrometers. In the former case, even narrow-band filters contain multiple emission lines, creating some temperature confusion. With imagers, however, rapid cadences are achievable and the field of view can be large. Velocities of the erupting structures can be measured by feature tracking. In the spectrometer case, slit spectrometers can provide spectrally pure images by “rastering” the slit to build up anmore » image. This method provides limited temporal resolution, but the plasma parameters can be accurately measured, including velocities along the line of sight. Both methods have benefits and are often used in tandem. In this paper we demonstrate for the first time that data from the wide slot on the Hinode EUV Imaging Spectrometer, along with imaging data from AIA, can be used to deconvolve velocity information at the start of an eruption, providing line-of-sight velocities across an extended field of view. Using He ii 256 Å slot data at flare onset, we observe broadening or shift(s) of the emission line of up to ±280 km s{sup −1}. These are seen at different locations—the redshifted plasma is seen where the hard X-ray source is later seen (energy deposition site). In addition, blueshifted plasma shows the very early onset of the fast rise of the filament.« less

PECULIAR STATIONARY EUV WAVE FRONTS IN THE ERUPTION ON 2011 MAY 11

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chandra, R.; Fulara, A.; Chen, P. F.

We present and interpret the observations of extreme ultraviolet (EUV) waves associated with a filament eruption on 2011 May 11. The filament eruption also produces a small B-class two ribbon flare and a coronal mass ejection. The event is observed by the Solar Dynamic Observatory with high spatio-temporal resolution data recorded by the Atmospheric Imaging Assembly. As the filament erupts, we observe two types of EUV waves (slow and fast) propagating outwards. The faster EUV wave has a propagation velocity of ∼500 km s{sup −1} and the slower EUV wave has an initial velocity of ∼120 km s{sup −1}. Wemore » report, for the first time, that not only does the slower EUV wave stop at a magnetic separatrix to form bright stationary fronts, but also the faster EUV wave transits a magnetic separatrix, leaving another stationary EUV front behind.« less

The ultraviolet radiation environment in the habitable zones around low-mass exoplanet host stars

NASA Astrophysics Data System (ADS)

France, Kevin; Linsky, Jeffrey L.; Loyd, R. O. Parke

2014-11-01

The EUV (200-911 Å), FUV (912-1750 Å), and NUV (1750-3200 Å) spectral energy distribution of exoplanet host stars has a profound influence on the atmospheres of Earth-like planets in the habitable zone. The stellar EUV radiation drives atmospheric heating, while the FUV (in particular, Ly α) and NUV radiation fields regulate the atmospheric chemistry: the dissociation of H2O and CO2, the production of O2 and O3, and may determine the ultimate habitability of these worlds. Despite the importance of this information for atmospheric modeling of exoplanetary systems, the EUV/FUV/NUV radiation fields of cool (K and M dwarf) exoplanet host stars are almost completely unconstrained by observation or theory. We present observational results from a Hubble Space Telescope survey of M dwarf exoplanet host stars, highlighting the importance of realistic UV radiation fields for the formation of potential biomarker molecules, O2 and O3. We conclude by describing preliminary results on the characterization of the UV time variability of these sources.

Extreme Ultraviolet Explorer observations of the magnetic cataclysmic variable RE 1938-461

NASA Technical Reports Server (NTRS)

Warren, John K.; Vallerga, John V.; Mauche, Christopher W.; Mukai, Koji; Siegmund, Oswald H. W.

1993-01-01

The magnetic cataclysmic variable RE 1938-461 was observed by the Extreme Ultraviolet Explorer (EUVE) Deep Survey instrument on 1992 July 8-9 during in-orbit calibration. It was detected in the Lexan/ boron (65-190 A) band, with a quiescent count rate of 0.0062 +/- 0.0017/s, and was not detected in the aluminum/carbon (160-360 A) band. The Lexan/boron count rate is lower than the corresponding ROSAT wide-field camera Lexan/boron count rate. This is consistent with the fact that the source was in a low state during an optical observation performed just after the EUVE observation, whereas it was in an optical high state during the ROSAT observation. The quiescent count rates are consistent with a virtual cessation of accretion. Two transient events lasting about 1 hr occurred during the Lexan/boron pointing, the second at a count rate of 0.050 +/- 0.006/s. This appears to be the first detection of an EUV transient during the low state of a magnetic cataclysmic variable. We propose two possible explanations for the transient events.

Monolithic pattern-sensitive detector

DOEpatents

Berger, Kurt W.

2000-01-01

Extreme ultraviolet light (EUV) is detected using a precisely defined reference pattern formed over a shallow junction photodiode. The reference pattern is formed in an EUV absorber preferably comprising nickel or other material having EUV- and other spectral region attenuating characteristics. An EUV-transmissive energy filter is disposed between a passivation oxide layer of the photodiode and the EUV transmissive energy filter. The device is monolithically formed to provide robustness and compactness.

Solar Illumination Control of the Polar Wind

NASA Astrophysics Data System (ADS)

Maes, L.; Maggiolo, R.; De Keyser, J.; André, M.; Eriksson, A. I.; Haaland, S.; Li, K.; Poedts, S.

2017-11-01

Polar wind outflow is an important process through which the ionosphere supplies plasma to the magnetosphere. The main source of energy driving the polar wind is solar illumination of the ionosphere. As a result, many studies have found a relation between polar wind flux densities and solar EUV intensity, but less is known about their relation to the solar zenith angle at the ionospheric origin, certainly at higher altitudes. The low energy of the outflowing particles and spacecraft charging means it is very difficult to measure the polar wind at high altitudes. We take advantage of an alternative method that allows estimations of the polar wind flux densities far in the lobes. We analyze measurements made by the Cluster spacecraft at altitudes from 4 up to 20 RE. We observe a strong dependence on the solar zenith angle in the ion flux density and see that both the ion velocity and density exhibit a solar zenith angle dependence as well. We also find a seasonal variation of the flux density.

Spectral and ion emission features of laser-produced Sn and SnO2 plasmas

NASA Astrophysics Data System (ADS)

Hui, Lan; Xin-Bing, Wang; Du-Luo, Zuo

2016-03-01

We have made a detailed comparison of the atomic and ionic debris, as well as the emission features of Sn and SnO2 plasmas under identical experimental conditions. Planar slabs of pure metal Sn and ceramic SnO2 are irradiated with 1.06 μm, 8 ns Nd:YAG laser pulses. Fast photography employing an intensified charge coupled device (ICCD), optical emission spectroscopy (OES), and optical time of flight emission spectroscopy are used as diagnostic tools. Our results show that the Sn plasma provides a higher extreme ultraviolet (EUV) conversion efficiency (CE) than the SnO2 plasma. However, the kinetic energies of Sn ions are relatively low compared with those of SnO2. OES studies show that the Sn plasma parameters (electron temperature and density) are lower compared to those of the SnO2 plasma. Furthermore, we also give the effects of the vacuum degree and the laser pulse energy on the plasma parameters. Project supported by the National Natural Science Foundation of China (Grant No. 11304235) and the Director Fund of WNLO, China.

Thermal Evolution and Radiative Output of Solar Flares Observed by the EUV Variability Experiment (EVE)

NASA Technical Reports Server (NTRS)

Chamberlin, P. C.; Milligan, R. O.; Woods, T. N.

2012-01-01

This paper describes the methods used to obtain the thermal evolution and radiative output during solar flares as observed by the Extreme u ltraviolet Variability Experiment (EVE) onboard the Solar Dynamics Ob servatory (SDO). Presented and discussed in detail are how EVE measur ements, due to its temporal cadence, spectral resolution and spectral range, can be used to determine how the thermal plasma radiates at v arious temperatures throughout the impulsive and gradual phase of fla res. EVE can very accurately determine the radiative output of flares due to pre- and in-flight calibrations. Events are presented that sh ow the total radiated output of flares depends more on the flare duration than the typical GOES X-ray peak magnitude classification. With S DO observing every flare throughout its entire duration and over a la rge temperature range, new insights into flare heating and cooling as well as the radiative energy release in EUV wavelengths support exis ting research into understanding the evolution of solar flares.

Solar Flare Impulsive Phase Observations from SDO and Other Observatories

NASA Technical Reports Server (NTRS)

Chamberlin, Phillip C.; Woods, Thomas N.; Schrijver, Karel; Warren, Harry; Milligan, Ryan; Christe, Steven; Brosius, Jeffrey W.

2010-01-01

With the start of normal operations of the Solar Dynamics Observatory in May 2010, the Extreme ultraviolet Variability Experiment (EVE) and the Atmospheric Imaging Assembly (AIA) have been returning the most accurate solar XUV and EUV measurements every 10 and 12 seconds, respectively, at almost 100% duty cycle. The focus of the presentation will be the solar flare impulsive phase observations provided by EVE and AIA and what these observations can tell us about the evolution of the initial phase of solar flares. Also emphasized throughout is how simultaneous observations with other instruments, such as RHESSI, SOHO-CDS, and HINODE-EIS, will help provide a more complete characterization of the solar flares and the evolution and energetics during the impulsive phase. These co-temporal observations from the other solar instruments can provide information such as extending the high temperature range spectra and images beyond that provided by the EUV and XUV wavelengths, provide electron density input into the lower atmosphere at the footpoints, and provide plasma flows of chromospheric evaporation, among other characteristics.

High-cadence observations of CME initiation and plasma dynamics in the corona with TESIS on board CORONAS-Photon

NASA Astrophysics Data System (ADS)

Bogachev, Sergey; Kuzin, Sergey; Zhitnik, I. A.; Bugaenko, O. I.; Goncharov, A. L.; Ignatyev, A. P.; Krutov, V. V.; Lomkova, V. M.; Mitrofanov, A. V.; Nasonkina, T. P.; Oparin, S. N.; Petzov, A. A.; Shestov, S. V.; Slemzin, V. A.; Soloviev, V. A.; Suhodrev, N. K.; Shergina, T. A.

The TESIS is an ensemble of space instruments designed in Lebedev Institute of Russian Academy of Sciences for spectroscopic and imaging investigation of the Sun in EUV and soft X-ray spectral range with high spatial, temporal and spectral resolution. From 2009 January, when TESIS was launched onboard the Coronas-Photon satellite, it provided about 200 000 new images and spectra of the Sun, obtained during one of the deepest solar minimum in last century. Because of the wide field of view (4 solar radii) and high sensitivity, TESIS provided high-quality data on the origin and dynamics of eruptive prominences and CMEs in the low and intermediate solar corona. TESIS is also the first EUV instrument which provided high-cadence observations of coronal bright points and solar spicules with temporal resolution of a few seconds. We present first results of TESIS observations and discuss them from a scientific point of view.

Resonance Scattering of Fe XVII X-ray and EUV Lines

NASA Technical Reports Server (NTRS)

Bhatia, A. K.; Saba, J. L. R.; Fisher, Richard R. (Technical Monitor)

2001-01-01

Over the years a number of calculations have been carried out to derive intensities of various X-ray and EUV lines in Fe XVII to compare with observed spectra. The predicted intensities have not agreed with solar observations, particularly for the line at 1.5.02 Angstroms; resonance scattering has been suggested as the source for much of the disagreement. The atomic data calculated earlier used seven configurations having n=3 orbitals and the scattering calculations were carried out only for incident energies above the threshold of the highest fine-structure level. These calculations have now been extended to thirteen configurations having n=4 orbitals and the scattering calculations are carried out below as well as above the threshold of the highest fine structure level. These improved calculations of Fe XVII change the intensity ratios compared to those obtained earlier, bringing the optically thin F(15.02)/F(16.78) ratio and several other ratios closer to the observed values. However, some disagreement with the solar observations still persists, even thought the agreement of the presently calculated optically thin F(15.02)/F(15.26) ratio with the experimental results of Brown et al. (1998) and Laming et al. (2000) has improved. Some of the remaining discrepancy is still thought to be the effect of opacity, which is consistent with expected physical conditions for solar sources. EUV intensity ratios are also calculated and compared with observations. Level populations and intensity ratios are calculated, as a function of column density of Fe XVII, in the slab and cylindrical geometries. As found previously, the predicted intensities for the resonance lines at 15.02 and 15.26 Angstroms exhibit initial increases in flux relative to the forbidden line at 17.10 Angstroms and the resonance line at 16.78 Angstroms as optical thickness increases. The same behavior is predicted for the lines at 12.262 and 12.122 Angstroms. Predicted intensities for some of the allowed EUV lines are also affected by opacity.

Analysis of filter tuning techniques for sequential orbit determination

NASA Technical Reports Server (NTRS)

Lee, T.; Yee, C.; Oza, D.

1995-01-01

This paper examines filter tuning techniques for a sequential orbit determination (OD) covariance analysis. Recently, there has been a renewed interest in sequential OD, primarily due to the successful flight qualification of the Tracking and Data Relay Satellite System (TDRSS) Onboard Navigation System (TONS) using Doppler data extracted onboard the Extreme Ultraviolet Explorer (EUVE) spacecraft. TONS computes highly accurate orbit solutions onboard the spacecraft in realtime using a sequential filter. As the result of the successful TONS-EUVE flight qualification experiment, the Earth Observing System (EOS) AM-1 Project has selected TONS as the prime navigation system. In addition, sequential OD methods can be used successfully for ground OD. Whether data are processed onboard or on the ground, a sequential OD procedure is generally favored over a batch technique when a realtime automated OD system is desired. Recently, OD covariance analyses were performed for the TONS-EUVE and TONS-EOS missions using the sequential processing options of the Orbit Determination Error Analysis System (ODEAS). ODEAS is the primary covariance analysis system used by the Goddard Space Flight Center (GSFC) Flight Dynamics Division (FDD). The results of these analyses revealed a high sensitivity of the OD solutions to the state process noise filter tuning parameters. The covariance analysis results show that the state estimate error contributions from measurement-related error sources, especially those due to the random noise and satellite-to-satellite ionospheric refraction correction errors, increase rapidly as the state process noise increases. These results prompted an in-depth investigation of the role of the filter tuning parameters in sequential OD covariance analysis. This paper analyzes how the spacecraft state estimate errors due to dynamic and measurement-related error sources are affected by the process noise level used. This information is then used to establish guidelines for determining optimal filter tuning parameters in a given sequential OD scenario for both covariance analysis and actual OD. Comparisons are also made with corresponding definitive OD results available from the TONS-EUVE analysis.

One-dimensional multispecies hydrodynamic models of the wakeside ionosphere of Titan

NASA Technical Reports Server (NTRS)

Keller, C. N.; Cravens, T. E.

1994-01-01

The passage of Voyager 1 through the wakeside region of Titan's ionosphere provided an interesting probe of this plasma environment. A one-dimensional multispecies hydrodynamic model was developed to study the wakeside ionosphere for radial distances ranging from 1.3 to 4.5 R(sub T) and included the ion species H2CN(+), C(sub n) H(sub m)(+), C2H5(+), CH5(+), H(+), H2(+), and H3(+). Plasma transport only along magnetic field lines was included. The only source of ion production was from electron impact ionization of Titan's atmosphere by radially streaming Saturnian magnetospheric electrons (i.e., the nightside wakeside ionosphere). We found that ion production rates due to hot (200 eV) magnetospheric electrons impacting Titan's neutral atmosphere along radial field lines were comparable to the dayside ion production rates due to solar EUV flux. The magnetic flux tube area was varied along with electron temperature, and the results were compared to the ion densities and velocities measured during the Voyager 1 encounter. We found outward ion flows of about (2 to 7 x 10(exp 6)/sq cm/s, resulting in a total ion loss from Titan into Saturn's magnetosphere of about (6 to 20) x 10(exp 24)/s.

Surface Inhomogeneities of the White Dwarf in the Binary EUVE J2013+400

NASA Astrophysics Data System (ADS)

Vennes, Stephane

We propose to study the white dwarf in the binary EUVE J2013+400. The object is paired with a dMe star and new extreme ultraviolet (EUV) observations will offer critical insights into the properties of the white dwarf. The binary behaves, in every other aspects, like its siblings EUVE J0720-317 and EUVE J1016-053 and new EUV observations will help establish their class properties; in particular, EUV photometric variations in 0720-317 and 1016-053 over a period of 11 hours and 57 minutes, respectively, are indicative of surface abundance inhomogeneities coupled with the white dwarfs rotation period. These variations and their large photospheric helium abundance are best explained by a diffusion-accretion model in which time-variable accretion and possible coupling to magnetic poles contribute to abundance variations across the surface and possibly as a function of depth. EUV spectroscopy will also enable a study of the helium abundance as a function of depth and a detailed comparison with theoretical diffusion profile.

Generation Mechanisms of Quasi-parallel and Quasi-circular Flare Ribbons in a Confined Flare

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hernandez-Perez, Aaron; Thalmann, Julia K.; Veronig, Astrid M.

We analyze a confined multiple-ribbon M2.1 flare (SOL2015-01-29T11:42) that originated from a fan-spine coronal magnetic field configuration, within active region NOAA 12268. The observed ribbons form in two steps. First, two primary ribbons form at the main flare site, followed by the formation of secondary ribbons at remote locations. We observe a number of plasma flows at extreme-ultraviolet temperatures during the early phase of the flare (as early as 15 minutes before the onset) propagating toward the formation site of the secondary ribbons. The secondary ribbon formation is co-temporal with the arrival of the pre-flare generated plasma flows. The primarymore » ribbons are co-spatial with Ramaty High Energy Spectroscopic Imager ( RHESSI ) hard X-ray sources, whereas no enhanced X-ray emission is detected at the secondary ribbon sites. The (E)UV emission, associated with the secondary ribbons, peaks ∼1 minute after the last RHESSI hard X-ray enhancement. A nonlinear force-free model of the coronal magnetic field reveals that the secondary flare ribbons are not directly connected to the primary ribbons, but to regions nearby. Detailed analysis suggests that the secondary brightenings are produced due to dissipation of kinetic energy of the plasma flows (heating due to compression), and not due to non-thermal particles accelerated by magnetic reconnection, as is the case for the primary ribbons.« less

Novel EUV photoresist for sub-7nm node (Conference Presentation)

NASA Astrophysics Data System (ADS)

Furukawa, Tsuyoshi; Naruoka, Takehiko; Nakagawa, Hisashi; Miyata, Hiromu; Shiratani, Motohiro; Hori, Masafumi; Dei, Satoshi; Ayothi, Ramakrishnan; Hishiro, Yoshi; Nagai, Tomoki

2017-04-01

Extreme ultraviolet (EUV) lithography has been recognized as a promising candidate for the manufacturing of semiconductor devices as LS and CH pattern for 7nm node and beyond. EUV lithography is ready for high volume manufacturing stage. For the high volume manufacturing of semiconductor devices, significant improvement of sensitivity and line edge roughness (LWR) and Local CD Uniformity (LCDU) is required for EUV resist. It is well-known that the key challenge for EUV resist is the simultaneous requirement of ultrahigh resolution (R), low line edge roughness (L) and high sensitivity (S). Especially high sensitivity and good roughness is important for EUV lithography high volume manufacturing. We are trying to improve sensitivity and LWR/LCDU from many directions. From material side, we found that both sensitivity and LWR/LCDU are simultaneously improved by controlling acid diffusion length and efficiency of acid generation using novel resin and PAG. And optimizing EUV integration is one of the good solution to improve sensitivity and LWR/LCDU. We are challenging to develop new multi-layer materials to improve sensitivity and LWR/LCDU. Our new multi-layer materials are designed for best performance in EUV lithography system. From process side, we found that sensitivity was substantially improved maintaining LWR applying novel type of chemical amplified resist (CAR) and process. EUV lithography evaluation results obtained for new CAR EUV interference lithography. And also metal containing resist is one possibility to break through sensitivity and LWR trade off. In this paper, we will report the recent progress of sensitivity and LWR/LCDU improvement of JSR novel EUV resist and process.

SUPRATHERMAL ELECTRONS IN TITAN’S SUNLIT IONOSPHERE: MODEL–OBSERVATION COMPARISONS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Vigren, E.; Edberg, N. J. T.; Wahlund, J.-E.

2016-08-01

The dayside ionosphere of the Saturnian satellite Titan is generated mainly from photoionization of N{sub 2} and CH{sub 4}. We compare model-derived suprathermal electron intensities with spectra measured by the Cassini Plasma Spectrometer/Electron Spectrometer (CAPS/ELS) in Titan's sunlit ionosphere (altitudes of 970–1250 km) focusing on the T40, T41, T42, and T48 Titan flybys by the Cassini spacecraft. The model accounts only for photoelectrons and associated secondary electrons, with a main input being the impinging solar EUV spectra as measured by the Thermosphere Ionosphere Mesosphere Energy and Dynamics/Solar EUV Experiment and extrapolated to Saturn. Associated electron-impact electron production rates have beenmore » derived from ambient number densities of N{sub 2} and CH{sub 4} (measured by the Ion Neutral Mass Spectrometer/Closed Source Neutral mode) and related energy-dependent electron-impact ionization cross sections. When integrating up to electron energies of 60 eV, covering the bulk of the photoelectrons, the model-based values exceed the observationally based values typically by factors of ∼3 ± 1. This finding is possibly related to current difficulties in accurately reproducing the observed electron number densities in Titan's dayside ionosphere. We compare the utilized dayside CAPS/ELS spectra with ones measured in Titan's nightside ionosphere during the T55–T59 flybys. The investigated nightside locations were associated with higher fluxes of high-energy (>100 eV) electrons than the dayside locations. As expected, for similar neutral number densities, electrons with energies <60 eV give a higher relative contribution to the total electron-impact ionization rates on the dayside (due to the contribution from photoelectrons) than on the nightside.« less

Models of the Solar Atmospheric Response to Flare Heating

NASA Technical Reports Server (NTRS)

Allred, Joel

2011-01-01

I will present models of the solar atmospheric response to flare heating. The models solve the equations of non-LTE radiation hydrodynamics with an electron beam added as a flare energy source term. Radiative transfer is solved in detail for many important optically thick hydrogen and helium transitions and numerous optically thin EUV lines making the models ideally suited to study the emission that is produced during flares. I will pay special attention to understanding key EUV lines as well the mechanism for white light production. I will also present preliminary results of how the model solar atmosphere responds to Fletcher & Hudson type flare heating. I will compare this with the results from flare simulations using the standard thick target model.

Universal EUV in-band intensity detector

DOEpatents

Berger, Kurt W.

2004-08-24

Extreme ultraviolet light is detected using a universal in-band detector for detecting extreme ultraviolet radiation that includes: (a) an EUV sensitive photodiode having a diode active area that generates a current responsive to EUV radiation; (b) one or more mirrors that reflects EUV radiation having a defined wavelength(s) to the diode active area; and (c) a mask defining a pinhole that is positioned above the diode active area, wherein EUV radiation passing through the pinhole is restricted substantially to illuminating the diode active area.

The extreme ultraviolet explorer mission

NASA Technical Reports Server (NTRS)

Malina, R. F.; Bowyer, S.

1988-01-01

The science design goals and engineering implementation for the Extreme Ultraviolet Explorer (EUVE) science payload are discussed. The primary scientific goal of the EUVE payload is to carry out an all-sky survey in the 100- to 900-A band of the spectrum. Another goal of the mission is to demonstrate the use of a scientific platform in near-earth orbit. EUVE data will be used to study the distribution of EUV stars in the neighborhood of the sun and the emission physics responsible for the EUV mission.

Characterization of extreme ultraviolet laser ablation mass spectrometry for actinide trace analysis and nanoscale isotopic imaging

DOE Office of Scientific and Technical Information (OSTI.GOV)

Green, Tyler; Kuznetsov, Ilya; Willingham, David

The purpose of this research was to characterize Extreme Ultraviolet Time-of-Flight (EUV TOF) Laser Ablation Mass Spectrometry for high spatial resolution elemental and isotopic analysis. We compare EUV TOF results with Secondary Ionization Mass Spectrometry (SIMS) to orient the EUV TOF method within the overall field of analytical mass spectrometry. Using the well-characterized NIST 61x glasses, we show that the EUV ionization approach produces relatively few molecular ion interferences in comparison to TOF SIMS. We demonstrate that the ratio of element ion to element oxide ion is adjustable with EUV laser pulse energy and that the EUV TOF instrument hasmore » a sample utilization efficiency of 0.014%. The EUV TOF system also achieves a lateral resolution of 80 nm and we demonstrate this lateral resolution with isotopic imaging of closely spaced particles or uranium isotopic standard materials.« less

Particle protection capability of SEMI-compliant EUV-pod carriers

NASA Astrophysics Data System (ADS)

Huang, George; He, Long; Lystad, John; Kielbaso, Tom; Montgomery, Cecilia; Goodwin, Frank

2010-04-01

With the projected rollout of pre-production extreme ultraviolet lithography (EUVL) scanners in 2010, EUVL pilot line production will become a reality in wafer fabrication companies. Among EUVL infrastructure items that must be ready, EUV mask carriers remain critical. To keep non-pellicle EUV masks free from particle contamination, an EUV pod concept has been extensively studied. Early prototypes demonstrated nearly particle-free results at a 53 nm PSL equivalent inspection sensitivity during EUVL mask robotic handling, shipment, vacuum pump-purge, and storage. After the passage of SEMI E152, which specifies the EUV pod mechanical interfaces, standards-compliant EUV pod prototypes, including a production version inner pod and prototype outer pod, were built and tested. Their particle protection capability results are reported in this paper. A state-of-the-art blank defect inspection tool was used to quantify their defect protection capability during mask robotic handling, shipment, and storage tests. To ensure the availability of an EUV pod for 2010 pilot production, the progress and preliminary test results of pre-production EUV outer pods are reported as well.

Objective for EUV microscopy, EUV lithography, and x-ray imaging

DOEpatents

Bitter, Manfred; Hill, Kenneth W.; Efthimion, Philip

2016-05-03

Disclosed is an imaging apparatus for EUV spectroscopy, EUV microscopy, EUV lithography, and x-ray imaging. This new imaging apparatus could, in particular, make significant contributions to EUV lithography at wavelengths in the range from 10 to 15 nm, which is presently being developed for the manufacturing of the next-generation integrated circuits. The disclosure provides a novel adjustable imaging apparatus that allows for the production of stigmatic images in x-ray imaging, EUV imaging, and EUVL. The imaging apparatus of the present invention incorporates additional properties compared to previously described objectives. The use of a pair of spherical reflectors containing a concave and convex arrangement has been applied to a EUV imaging system to allow for the image and optics to all be placed on the same side of a vacuum chamber. Additionally, the two spherical reflector segments previously described have been replaced by two full spheres or, more precisely, two spherical annuli, so that the total photon throughput is largely increased. Finally, the range of permissible Bragg angles and possible magnifications of the objective has been largely increased.

Surface roughness control by extreme ultraviolet (EUV) radiation

NASA Astrophysics Data System (ADS)

Ahad, Inam Ul; Obeidi, Muhannad Ahmed; Budner, Bogusław; Bartnik, Andrzej; Fiedorowicz, Henryk; Brabazon, Dermot

2017-10-01

Surface roughness control of polymeric materials is often desirable in various biomedical engineering applications related to biocompatibility control, separation science and surface wettability control. In this study, Polyethylene terephthalate (PET) polymer films were irradiated with Extreme ultraviolet (EUV) photons in nitrogen environment and investigations were performed on surface roughness modification via EUV exposure. The samples were irradiated at 3 mm and 4 mm distance from the focal spot to investigate the effect of EUV fluence on topography. The topography of the EUV treated PET samples were studied by AFM. The detailed scanning was also performed on the sample irradiated at 3 mm. It was observed that the average surface roughness of PET samples was increased from 9 nm (pristine sample) to 280 nm and 253 nm for EUV irradiated samples. Detailed AFM studies confirmed the presence of 1.8 mm wide period U-shaped channels in EUV exposed PET samples. The walls of the channels were having FWHM of about 0.4 mm. The channels were created due to translatory movements of the sample in horizontal and transverse directions during the EUV exposure. The increased surface roughness is useful for many applications. The nanoscale channels fabricated by EUV exposure could be interesting for microfluidic applications based on lab-on-a-chip (LOC) devices.

EUV mask pilot line at Intel Corporation

NASA Astrophysics Data System (ADS)

Stivers, Alan R.; Yan, Pei-Yang; Zhang, Guojing; Liang, Ted; Shu, Emily Y.; Tejnil, Edita; Lieberman, Barry; Nagpal, Rajesh; Hsia, Kangmin; Penn, Michael; Lo, Fu-Chang

2004-12-01

The introduction of extreme ultraviolet (EUV) lithography into high volume manufacturing requires the development of a new mask technology. In support of this, Intel Corporation has established a pilot line devoted to encountering and eliminating barriers to manufacturability of EUV masks. It concentrates on EUV-specific process modules and makes use of the captive standard photomask fabrication capability of Intel Corporation. The goal of the pilot line is to accelerate EUV mask development to intersect the 32nm technology node. This requires EUV mask technology to be comparable to standard photomask technology by the beginning of the silicon wafer process development phase for that technology node. The pilot line embodies Intel's strategy to lead EUV mask development in the areas of the mask patterning process, mask fabrication tools, the starting material (blanks) and the understanding of process interdependencies. The patterning process includes all steps from blank defect inspection through final pattern inspection and repair. We have specified and ordered the EUV-specific tools and most will be installed in 2004. We have worked with International Sematech and others to provide for the next generation of EUV-specific mask tools. Our process of record is run repeatedly to ensure its robustness. This primes the supply chain and collects information needed for blank improvement.

Blob Formation and Ejection in Coronal Jets due to the Plasmoid and Kelvin–Helmholtz Instabilities

DOE Office of Scientific and Technical Information (OSTI.GOV)

Ni, Lei; Lin, Jun; Zhang, Qing-Min

2017-05-20

We perform 2D resistive magnetohydrodynamic simulations of coronal jets driven by flux emergence along the lower boundary. The reconnection layers are susceptible to the formation of blobs that are ejected in the jet. Our simulation with low plasma β (Case I) shows that magnetic islands form easily and propagate upward in the jet. These islands are multithermal and thus are predicted to show up in hot channels (335 Å and 211 Å) and the cool channel (304 Å) in observations by the Atmospheric Imaging Assembly (AIA) on the Solar Dynamics Observatory . The islands have maximum temperatures of 8 MK,more » lifetimes of 120 s, diameters of 6 Mm, and velocities of 200 km s{sup −1}. These parameters are similar to the properties of blobs observed in extreme-ultraviolet (EUV) jets by AIA. The Kelvin–Helmholtz instability develops in our simulation with moderately high plasma β (Case II) and leads to the formation of bright vortex-like blobs above the multiple high magnetosonic Mach number regions that appear along the jet. These vortex-like blobs can also be identified in the AIA channels. However, they eventually move downward and disappear after the high magnetosonic Mach number regions disappear. In the lower plasma β case, the lifetime for the jet is shorter, the jet and magnetic islands are formed with higher velocities and temperatures, the current-sheet fragments are more chaotic, and more magnetic islands are generated. Our results show that the plasmoid instability and Kelvin–Helmholtz instability along the jet are both possible causes of the formation of blobs observed at EUV wavelengths.« less

EUVE GO Survey: High Levels of User Satisfaction

NASA Astrophysics Data System (ADS)

Stroozas, B. A.

2000-12-01

This paper describes the results of a detailed customer survey of Guest Observers (GOs) for NASA's Extreme Ultraviolet Explorer (EUVE) astronomy satellite observatory. The purpose of the research survey was to (1) measure the levels of GO customer satisfaction with respect to EUVE observing services, and (2) compare the observing experiences of EUVE GOs with their experiences using other satellite observatories. This survey was conducted as a business research project -- part of the author's graduate work as an MBA candidate. A total sample of 38 respondents, from a working population of 101 "active" EUVE GOs, participated in this survey. The results, which provided a profile of the "typical" EUVE GO, showed in a statistically significant fashion that these GOs were more than satisfied with the available EUVE observing services. In fact, the sample GOs generally rated their EUVE observing experiences to be better than average as compared to their experiences as GOs on other missions. These relatively high satisfaction results are particularly pleasing to the EUVE Project which, given its significantly reduced staffing environment at U.C. Berkeley, has continued to do more with less. This paper outlines the overall survey process: the relevant background and previous research, the survey design and methodology, and the final results and their interpretation. The paper also points out some general limitations and weaknesses of the study, along with some recommended actions for the EUVE Project and for NASA in general. This work was funded by NASA/UCB Cooperative Agreement NCC5-138.

Temporal variations of solar EUV, UV, and 10,830-A radiations

NASA Technical Reports Server (NTRS)

Donnelly, R. F.; Hinteregger, H. E.; Heath, D. F.

1986-01-01

The temporal characteristics of the full-disk chromospheric EUV fluxes agree well with those of the ground-based measurements of the chromospheric He I absorption line at 10,830 A and differ systematically from those of the coronal EUV and 10.7-cm flux. The ratio of the flux increase during the rise of solar cycle 21 to that during solar rotation variations is uniformly high for the chromospheric EUV and corroborating 10,830-A fluxes, highest for the transition region and 'cool' coronal EUV fluxes (T less than 2 x 10 to the 6th K), and lowest for the 'hot' coronal EUV and 10.7-cm flux. The rise and decay rates of episodes of major activity progress from those for the hot coronal EUV lines and the 10.7-cm flux to slower values for the chromospheric H Lyman alpha line, 10,830-A line, and photospheric 2050-A UV flux. It is suggested that active region remnants contribute significantly to the solar cycle increase and during the decay of episodes of major activity. The ratio of power in 13-day periodicity to that for 27 days in high (1/3) for the photospheric UV flux, medium (1/6) for the chromospheric EUV and 10,830-A fluxes, and small to negligible for the hot coronal EUV fluxes. These ratios are used to estimate the dependence of active region emission on the solar central meridian distance for chromospheric and coronal EUV flux.

X-ray And EUV Spectroscopy Of Highly Charged Tungsten Ions

DOE Office of Scientific and Technical Information (OSTI.GOV)

Biedermann, Christoph; Radtke, Rainer

2009-09-10

The Berlin EBIT has been established by the Max-Planck-Institut fuer Plasmaphysik to generate atomic physics data in support of research in the field of controlled nuclear fusion, by measuring the radiation from highly charged ions in the x-ray, extreme ultraviolet and visible spectral ranges and providing valuable diagnostics for high temperature plasmas. In future fusion devices, for example ITER, currently being constructed at Cadarache, France, the plasma facing components will be armored with high-Z materials, most likely tungsten, due to the favorable properties of this element. At the same time the tremendous radiation cooling of these high-Z materials represents amore » threat to fusion and obliges one to monitor carefully the radiation. With EBIT a selected ensemble of ions in specific charge states can be produced, stored and excited for spectroscopic investigations. Employing this technique, we have for example resolved the wide structure observed around 5 nm at the ASDEX Upgrade tokamak as originating from E1-transitions into the open 4d shell of tungsten ions in charge states 25+ to 37+ producing a band-like emission pattern. Further, these ions emit well-separated M1 lines in the EUV range around 65 nm suitable for plasma diagnostics. Kr-like to Cr-like tungsten ions (38+ to 50+) show strong soft-x-ray lines in the range 0.5 to 2 and 5 to 15 nm. Lines of even higher charged tungsten ions, up to Ne-like W{sup 64+}, abundant in the core plasma of present and future fusion test devices, have been investigated with high resolution Bragg-crystal spectroscopy at 0.13 nm. Recently, x-ray spectroscopic measurements of the dielectronic recombination LMn resonances of W{sup 60+} to W{sup 67+} ions have been preformed and compare well with atomic structure calculations.« less

Extreme ultraviolet (EUV) solar spectral irradiance (SSI) for ionospheric application - history and contemporary state-of-art

NASA Astrophysics Data System (ADS)

Schmidtke, G.; Jacobi, Ch.; Nikutowski, B.; Erhardt, Ch.

2014-11-01

After a historical survey of space related EUV measurements in Germany and the role of Karl Rawer in pursuing this work, we describe present developments in EUV spectroscopy and provide a brief outlook on future activities. The group of Karl Rawer has performed the first scientific space project in Western Europe on 19th October 1954. Then it was decided to include the field of solar EUV spectroscopy in ionospheric investigations. Starting in 1957 an intensified development of instrumentation was going on to explore solar EUV radiation, atmospheric airglow and auroral emissions until the institute had to stop space activities in the early nineteen-eighties. EUV spectroscopy was continued outside of the institute during eight years. This area of work was supported again by the institute developing the Auto-Calibrating Spectrometers (SolACES) for a mission on the International Space Station (ISS). After more than six years in space the instrument is still in operation. Meanwhile the work on the primary task also to validate EUV data available from other space missions has made good progress. The first results of validating those data and combine them into one set of EUV solar spectral irradiance are very promising. It will be recommended for using it by the science and application community. Moreover, a new low-cost type of an EUV spectrometer is presented for monitoring the solar EUV radiation. It shall be further developed for providing EUV-TEC data to be applied in ionospheric models replacing the Covington index F10.7. Applying these data for example in the GNSS signal evaluation a more accurate determination of GNSS receiver positions is expected for correcting the propagation delays of navigation signals traveling through the ionosphere from space to earth. - Latest results in the field of solar EUV spectroscopy are discussed, too.

Adding EUV reflectance to aluminum-coated mirrors for space-based observation

NASA Astrophysics Data System (ADS)

Allred, David D.; Turley, R. Steven; Thomas, Stephanie M.; Willett, Spencer G.; Greenburg, Michael J.; Perry, Spencer B.

2017-09-01

Protective layers on aluminum mirror surfaces which can be removed via the use of atomic hydrogen or hydrogen plasmas at the point of use in space may allow an expansion of broad-band mirrors into the EUV. LUVOIR (large, UV-optical-IR telescope) is a potential NASA flagship space-based observatory of the 2020's or 30's. It would utilize the largest mirrors ever flown1 . Their reflective coating will almost certainly be aluminum, since such telescopes would profit from truly broad-band mirrors. To achieve reflectance over the broadest band, the top surface of such aluminum mirrors, however, needs to be bare, without the oxide layers that naturally form in air. This will open the 11 to 15 eV band. Since thin aluminum films are largely transparent between 15 and 70 eV an EUV mirror under the aluminum could make EUV bands such as 30.4 nm available for space-based astrophysics without sacrificing mirror IR, visible and UV reflectance. The local space environment for the observatory is sufficiently oxygen-free that the surface should remain bare for decades. We discuss protecting as-deposited aluminum mirrors with robust, oxygenimpenetrable, barrier layers applied in vacuo to the aluminum immediately after deposition and before air contact. The goal is that the barrier could also be cleanly, and relatively easily, removed once the mirror is in space. We propose hydrogen atoms as the means for removing the overcoat, since they can be expected to meet the criteria that the means is gentle enough to not roughen the mirror surface, and does not redeposit material on the mirror or other spacecraft components. We have investigated both organic and inorganic (such as, a-Si) hydrogen-removable films that can be applied to the aluminum immediately after its deposition have been investigated. We also examined the REVAP technique, using Cd and Zn. Agglomeration limited their effectiveness as barrier layers. That and dealing with the reevaporated atoms may limit their utility as barrier materials.

EUV patterning using CAR or MOX photoresist at low dose exposure for sub 36nm pitch

NASA Astrophysics Data System (ADS)

Thibaut, Sophie; Raley, Angélique; Lazarrino, Frederic; Mao, Ming; De Simone, Danilo; Piumi, Daniele; Barla, Kathy; Ko, Akiteru; Metz, Andrew; Kumar, Kaushik; Biolsi, Peter

2018-04-01

The semiconductor industry has been pushing the limits of scalability by combining 193nm immersion lithography with multi-patterning techniques for several years. Those integrations have been declined in a wide variety of options to lower their cost but retain their inherent variability and process complexity. EUV lithography offers a much desired path that allows for direct print of line and space at 36nm pitch and below and effectively addresses issues like cycle time, intra-level overlay and mask count costs associated with multi-patterning. However it also brings its own sets of challenges. One of the major barrier to high volume manufacturing implementation has been hitting the 250W power exposure required for adequate throughput [1]. Enabling patterning using a lower dose resist could help move us closer to the HVM throughput targets assuming required performance for roughness and pattern transfer can be met. As plasma etching is known to reduce line edge roughness on 193nm lithography printed features [2], we investigate in this paper the level of roughness that can be achieved on EUV photoresist exposed at a lower dose through etch process optimization into a typical back end of line film stack. We will study 16nm lines printed at 32 and 34nm pitch. MOX and CAR photoresist performance will be compared. We will review step by step etch chemistry development to reach adequate selectivity and roughness reduction to successfully pattern the target layer.

DARK RIBBONS PROPAGATING AND SWEEPING ACROSS EXTREME ULTRAVIOLET STRUCTURES AFTER FILAMENT ERUPTIONS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Xiao, Junmin; Zhang, Jun; Li, Ting

2015-05-20

With observations from the Atmospheric Imaging Assembly on board the Solar Dynamics Observatory, we first report that dark ribbons (DRs) moved apart from the filament channel and swept across EUV structures after filament eruptions on 2013 June 23 and 2012 February 10 and 24, respectively. In the first event, the DR with a length of 168 Mm appeared at 100 Mm to the northwest of the filament channel, where the filament erupted 15 hr previously. The DR moved toward the northwest with the different sections having different velocities, ranging from 0.3 to 1.6 km s{sup −1}. When the DR’s middlemore » part swept across a strong EUV structure, the motion of this part was blocked, appearing to deflect the DR. With the DR propagation, the connection of the surrounding EUV structures gradually changed. After one day passed, the DR eventually disappeared. In the other two events, the dynamic evolution of the DRs was similar to that in the first event. Based on the observations, we speculate that the reconnection during the filament eruption changes the configuration of the surrounding magnetic fields systematically. During the reconnection process, magnetic fields are deflecting and the former arbitrarily distributed magnetic fields are rearranged along specific directions. The deflection of magnetic fields results in an instantaneous void region where the magnetic strength is smaller and the plasma density is lower. Consequently, the void region is observed as a DR and propagates outward with the reconnection developing.« less

Soho and Cluster - The scientific instruments

NASA Technical Reports Server (NTRS)

Domingo, V.; Schmidt, R.; Poland, A. I.; Goldstein, M. L.

1988-01-01

The mission goals and instrumentation of the Soho and cluster spacecraft to be launched in 1995 as part of the international Solar-Terrestrial Science Program are discussed. Instruments such as normal-incidence, grazing-incidence, and EUV coronal spectrometers aboard the Soho spacecraft will study the origin of the solar wind and the physical properties of the solar atmosphere. The four Cluster spacecraft will measure electric and magnetic fields, plasmas, and energetic particles using instruments including a wide-band receiver system, a relaxation sounder, and a search coil magnetometer.

Lobster eye as a collector for water window microscopy

NASA Astrophysics Data System (ADS)

Pina, L.; Maršíková, V.; Inneman, A.; Nawaz, M. F.; Jančárek, A.; Havlíková, R.

2017-08-01

Imaging in EUV, SXR and XR spectral bands of radiation is of increasing interest. Material science, biology and hot plasma are examples of relevant fast developing areas. Applications include spectroscopy, astrophysics, Soft X-ray Ray metrology, Water Window microscopy, radiography and tomography. Especially Water Window imaging has still not fully recognized potential in biology and medicine microscopy applications. Theoretical study and design of Lobster Eye (LE) optics as a collector for water window (WW) microscopy and comparison with a similar size ellipsoidal mirror condensor are presented.

Structure and dynamics of the umagnetized plasma around comet 67P/CG

NASA Astrophysics Data System (ADS)

Henri, P.; Vallières, X.; Gilet, N.; Hajra, R.; Moré, J.; Goetz, C.; Richter, I.; Glassmeier, K. H.; Galand, M. F.; Heritier, K. L.; Eriksson, A. I.; Nemeth, Z.; Tsurutani, B.; Rubin, M.; Altwegg, K.

2016-12-01

At distances close enough to the Sun, when comets are characterised by a significant outgassing, the cometary neutral density may become large enough for both the cometary plasma and the cometary gas to be coupled, through ion-neutral and electron-neutral collisions. This coupling enables the formation of an unmagnetised expanding cometary ionosphere around the comet nucleus, also called diamagnetic cavity, within which the solar wind magnetic field cannot penetrate. The instruments of the Rosetta Plasma Consortium (RPC), onboard the Rosetta Orbiter, enable us to better constrain the structure, dynamics and stability of the plasma around comet 67P/CG. Recently, magnetic field measurements (RPC-MAG) have shown the existence of such a diamagnetic region around comet 67P/CG [Götz et al., 2016]. Contrary to a single, large scale, diamagnetic cavity such as what was observed around comet Halley, Rosetta have crossed several diamagnetic structures along its trajectory around comet 67P/CG. Using electron density measurements from the Mutual Impedance Probe (RPC-MIP) during the different diamagnetic cavity crossings, identified by the flux gate magnetometer (RPC-MAG), we map the unmagnetised plasma density around comet 67P/CG. Our aims is to better constrain the structure, dynamics and stability of this inner cometary plasma layer characterised by cold electrons (as witnessed by the Langmuir Probes RPC-LAP). The ionisation ratio in these unmagnetised region(s) is computed from the measured electron (RPC-MIP) and neutral gas (ROSINA/COPS) densities. In order to assess the importance of solar EUV radiation as a source of ionisation, the observed electron density will be compared to a the density expected from an ionospheric model taking into account solar radiation absorption. The crossings of diamagnetic region(s) by Rosetta show that the unmagnetised cometary plasma is particularly homogeneous, compared to the highly dynamical magnetised plasma observed in adjacent magnetised regions. Moreover, during the crossings of multiple, successive diamagnetic region(s) over time scales of tens of minutes or hours, the plasma density is almost identical in the different unmagnetised regions, suggesting that these unmagnetised regions may be a single diamagnetic structure crossed several times by Rosetta.

Design and progress in the fabrication of an EUV micro exposure tool optics for PREUVE

NASA Astrophysics Data System (ADS)

Geyl, Roland; Tanne, Jean-Francois

2001-12-01

SAGEM, through its REOSC product line, is participating since November 1999 to PREUVE, the French EUV initiative, and work within this program especially in the field of EUV illumination and projection optics. After a short description of the PREUVE main lines of activity, we will detail our contributions to this program and work progress. This is mainly focused on basic EUV optics fabrication technology in order to ensure the fabrication of the entire optics assembly of an EUV micro exposure tool.

Ionospheric control of the dawn-dusk asymmetry of the Mars magnetotail current sheet

NASA Astrophysics Data System (ADS)

Liemohn, Michael W.; Xu, Shaosui; Dong, Chuanfei; Bougher, Stephen W.; Johnson, Blake C.; Ilie, Raluca; De Zeeuw, Darren L.

2017-06-01

This study investigates the role of solar EUV intensity at controlling the location of the Mars magnetotail current sheet and the structure of the lobes. Four simulation results are examined from a multifluid magnetohydrodynamic model. The solar wind and interplanetary magnetic field (IMF) conditions are held constant, and the Mars crustal field sources are omitted from the simulation configuration. This isolates the influence of solar EUV. It is found that solar maximum conditions, regardless of season, result in a Venus-like tail configuration with the current sheet shifted to the -Y (dawnside) direction. Solar minimum conditions result in a flipped tail configuration with the current sheet shifted to the +Y (duskside) direction. The lobes follow this pattern, with the current sheet shifting away from the larger lobe with the higher magnetic field magnitude. The physical process responsible for this solar EUV control of the magnetotail is the magnetization of the dayside ionosphere. During solar maximum, the ionosphere is relatively strong and the draped IMF field lines quickly slip past Mars. At solar minimum, the weaker ionosphere allows the draped IMF to move closer to the planet. These lower altitudes of the closest approach of the field line to Mars greatly hinder the day-to-night flow of magnetic flux. This results in a buildup of magnetic flux in the dawnside lobe as the S-shaped topology on that side of the magnetosheath extends farther downtail. The study demonstrates that the Mars dayside ionosphere exerts significant control over the nightside induced magnetosphere of that planet.