Plasma Processes for Semiconductor Fabrication

NASA Astrophysics Data System (ADS)

Hitchon, W. N. G.

1999-01-01

Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practicing engineers in the semiconductor industry.

Monitoring non-thermal plasma processes for nanoparticle synthesis

NASA Astrophysics Data System (ADS)

Mangolini, Lorenzo

2017-09-01

Process characterization tools have played a crucial role in the investigation of dusty plasmas. The presence of dust in certain non-thermal plasma processes was first detected by laser light scattering measurements. Techniques like laser induced particle explosive evaporation and ion mass spectrometry have provided the experimental evidence necessary for the development of the theory of particle nucleation in silane-containing non-thermal plasmas. This review provides first a summary of these early efforts, and then discusses recent investigations using in situ characterization techniques to understand the interaction between nanoparticles and plasmas. The advancement of such monitoring techniques is necessary to fully develop the potential of non-thermal plasmas as unique materials synthesis and processing platforms. At the same time, the strong coupling between materials and plasma properties suggest that it is also necessary to advance techniques for the measurement of plasma properties while in presence of dust. Recent progress in this area will be discussed.

Vapor Phase Deposition Using Plasma Spray-PVD™

NASA Astrophysics Data System (ADS)

von Niessen, K.; Gindrat, M.; Refke, A.

2010-01-01

Plasma spray—physical vapor deposition (PS-PVD) is a low pressure plasma spray technology to deposit coatings out of the vapor phase. PS-PVD is a part of the family of new hybrid processes recently developed by Sulzer Metco AG (Switzerland) on the basis of the well-established low pressure plasma spraying (LPPS) technology. Included in this new process family are plasma spray—chemical vapor deposition (PS-CVD) and plasma spray—thin film (PS-TF) processes. In comparison to conventional vacuum plasma spraying and LPPS, these new processes use a high energy plasma gun operated at a work pressure below 2 mbar. This leads to unconventional plasma jet characteristics which can be used to obtain specific and unique coatings. An important new feature of PS-PVD is the possibility to deposit a coating not only by melting the feed stock material which builds up a layer from liquid splats, but also by vaporizing the injected material. Therefore, the PS-PVD process fills the gap between the conventional PVD technologies and standard thermal spray processes. The possibility to vaporize feedstock material and to produce layers out of the vapor phase results in new and unique coating microstructures. The properties of such coatings are superior to those of thermal spray and EB-PVD coatings. This paper reports on the progress made at Sulzer Metco to develop functional coatings build up from vapor phase of oxide ceramics and metals.

Method for atmospheric pressure reactive atom plasma processing for surface modification

DOEpatents

Carr, Jeffrey W [Livermore, CA

2009-09-22

Reactive atom plasma processing can be used to shape, polish, planarize and clean the surfaces of difficult materials with minimal subsurface damage. The apparatus and methods use a plasma torch, such as a conventional ICP torch. The workpiece and plasma torch are moved with respect to each other, whether by translating and/or rotating the workpiece, the plasma, or both. The plasma discharge from the torch can be used to shape, planarize, polish, and/or clean the surface of the workpiece, as well as to thin the workpiece. The processing may cause minimal or no damage to the workpiece underneath the surface, and may involve removing material from the surface of the workpiece.

Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low T{sub e} plasma sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Jagtiani, Ashish V.; Miyazoe, Hiroyuki; Chang, Josephine

2016-01-15

The ability to achieve atomic layer precision is the utmost goal in the implementation of atomic layer etch technology. Carbon-based materials such as carbon nanotubes (CNTs) and graphene are single atomic layers of carbon with unique properties and, as such, represent the ultimate candidates to study the ability to process with atomic layer precision and assess impact of plasma damage to atomic layer materials. In this work, the authors use these materials to evaluate the atomic layer processing capabilities of electron beam generated plasmas. First, the authors evaluate damage to semiconducting CNTs when exposed to beam-generated plasmas and compare thesemore » results against the results using typical plasma used in semiconductor processing. The authors find that the beam generated plasma resulted in significantly lower current degradation in comparison to typical plasmas. Next, the authors evaluated the use of electron beam generated plasmas to process graphene-based devices by functionalizing graphene with fluorine, nitrogen, or oxygen to facilitate atomic layer deposition (ALD). The authors found that all adsorbed species resulted in successful ALD with varying impact on the transconductance of the graphene. Furthermore, the authors compare the ability of both beam generated plasma as well as a conventional low ion energy inductively coupled plasma (ICP) to remove silicon nitride (SiN) deposited on top of the graphene films. Our results indicate that, while both systems can remove SiN, an increase in the D/G ratio from 0.08 for unprocessed graphene to 0.22 to 0.26 for the beam generated plasma, while the ICP yielded values from 0.52 to 1.78. Generally, while some plasma-induced damage was seen for both plasma sources, a much wider process window as well as far less damage to CNTs and graphene was observed when using electron beam generated plasmas.« less

Ti film deposition process of a plasma focus: Study by an experimental design

NASA Astrophysics Data System (ADS)

Inestrosa-Izurieta, M. J.; Moreno, J.; Davis, S.; Soto, L.

2017-10-01

The plasma generated by plasma focus (PF) devices have substantially different physical characteristics from another plasma, energetic ions and electrons, compared with conventional plasma devices used for plasma nanofabrication, offering new and unique opportunities in the processing and synthesis of Nanomaterials. This article presents the use of a plasma focus of tens of joules, PF-50J, for the deposition of materials sprayed from the anode by the plasma dynamics in the axial direction. This work focuses on the determination of the most significant effects of the technological parameters of the system on the obtained depositions through the use of a statistical experimental design. The results allow us to give a qualitative understanding of the Ti film deposition process in our PF device depending on four different events provoked by the plasma dynamics: i) an electric erosion of the outer material of the anode; ii) substrate ablation generating an interlayer; iii) electron beam deposition of material from the center of the anode; iv) heat load provoking clustering or even melting of the deposition surface.

Process for forming exoergic structures with the use of a plasma

DOEpatents

Kelly, M.D.

1987-05-29

A method of forming exoergic structures, as well as exoergic structures produced by the method, is provided. The method comprises the steps of passing a plasma-forming gas through a plasma spray gun, forming a plasma spray, introducing exoergic material into the plasma spray and directing the plasma spray toward a substrate, and allowing the exoergic material to become molten in the plasma spray and to thereafter impinge on the substrate to form a solid mass of exoergic material, the shape of which corresponds to the shape of the substrate.

Novel biomaterials: plasma-enabled nanostructures and functions

NASA Astrophysics Data System (ADS)

Levchenko, Igor; Keidar, Michael; Cvelbar, Uroš; Mariotti, Davide; Mai-Prochnow, Anne; Fang, Jinghua; (Ken Ostrikov, Kostya

2016-07-01

Material processing techniques utilizing low-temperature plasmas as the main process tool feature many unique capabilities for the fabrication of various nanostructured materials. As compared with the neutral-gas based techniques and methods, the plasma-based approaches offer higher levels of energy and flux controllability, often leading to higher quality of the fabricated nanomaterials and sometimes to the synthesis of the hierarchical materials with interesting properties. Among others, nanoscale biomaterials attract significant attention due to their special properties towards the biological materials (proteins, enzymes), living cells and tissues. This review briefly examines various approaches based on the use of low-temperature plasma environments to fabricate nanoscale biomaterials exhibiting high biological activity, biological inertness for drug delivery system, and other features of the biomaterials make them highly attractive. In particular, we briefly discuss the plasma-assisted fabrication of gold and silicon nanoparticles for bio-applications; carbon nanoparticles for bioimaging and cancer therapy; carbon nanotube-based platforms for enzyme production and bacteria growth control, and other applications of low-temperature plasmas in the production of biologically-active materials.

Preparation Of Sources For Plasma Vapor Deposition

NASA Technical Reports Server (NTRS)

Waters, William J.; Sliney, Hal; Kowalski, D.

1993-01-01

Multicomponent metal targets serving as sources of vapor for plasma vapor deposition made in modified pressureless-sintering process. By use of targets made in modified process, one coats components with materials previously plasma-sprayed or sintered but not plasma-vapor-deposited.

Method of processing materials using an inductively coupled plasma

DOEpatents

Hull, Donald E.; Bieniewski, Thomas M.

1990-01-01

A method for making fine power using an inductively coupled plasma. The method provides a gas-free environment, since the plasma is formed without using a gas. The starting material used in the method is in solid form.

Ceramic Top Coats of Plasma-Sprayed Thermal Barrier Coatings: Materials, Processes, and Properties

NASA Astrophysics Data System (ADS)

Bakan, Emine; Vaßen, Robert

2017-08-01

The ceramic top coat has a major influence on the performance of the thermal barrier coating systems (TBCs). Yttria-partially-stabilized zirconia (YSZ) is the top coat material frequently used, and the major deposition processes of the YSZ top coat are atmospheric plasma spraying and electron beam physical vapor deposition. Recently, also new thermal spray processes such as suspension plasma spraying or plasma spray-physical vapor deposition have been intensively investigated for TBC top coat deposition. These new processes and particularly the different coating microstructures that can be deposited with them will be reviewed in this article. Furthermore, the properties and the intrinsic-extrinsic degradation mechanisms of the YSZ will be discussed. Following the TBC deposition processes and standard YSZ material, alternative ceramic materials such as perovskites and hexaaluminates will be summarized, while properties of pyrochlores with regard to their crystal structure will be discussed more in detail. The merits of the pyrochlores such as good CMAS resistance as well as their weaknesses, e.g., low fracture toughness, processability issues, will be outlined.

Improvement of technical purpose materials performance characteristics with the radio frequency low pressure plasma

NASA Astrophysics Data System (ADS)

Makhotkina, L. Yu; Khristoliubova, V. I.

2017-11-01

The main aim of the work is to solve the actual problem of increasing the competitiveness of tanning products by reducing the prime cost and improving the quality of finished products due to the increased durability of the working elements of tanneries. The impact of the low pressure radio frequency (RF) plasma in the processes of treating for modification of the materials for special purposes is considered in the article. The results of working elements of tanneries and the materials for special purposes sample processing by a RF low pressure plasma are described. As a result of leather materials nano structuring and nano modifying physical, mechanical and hygienic characteristics were increased. Processing of the technical purpose materials allows to increase operational performance of products and extend their lifespan.

Process for forming exoergic structures with the use of a plasma

DOEpatents

Kelly, Michael D.

1989-02-21

A method of forming exoergic structures, as well as exoergic structures produced by the method, is provided. The method comprises the steps of passing a plasma-forming gas through a plasma spray gun, forming a plasma spray, introducing exoergic material into the plasma spray and directing the plasma spray toward a substrate, and allowing the exoergic material to become molten, without chemically reacting in the plasma spray and to thereafter impinge on the substrate to form a solid mass of exoergic material, the shape of which corresponds to the shape of the substrate.

PREFACE: 11th Asia-Pacific Conference on Plasma Science and Technology (APCPST-11) and 25th Symposium on Plasma Science for Materials (SPSM-25)

NASA Astrophysics Data System (ADS)

Watanabe, Takayuki; Kaneko, Toshio; Sekine, Makoto; Tanaka, Yasunori

2013-06-01

The 11th Asia-Pacific Conference on Plasma Science and Technology (APCPST-11) was held in Kyoto, Japan on 2-5 October 2012 with the 25th Symposium on Plasma Science for Materials (SPSM-25). SPSM has been held annually since 1988 under the sponsorship of The 153rd Committee on Plasma Materials Science, Japan Society for the Promotion of Science (JSPS). This symposium is one of the major activities of the Committee, which is organized by researchers in academia and industry for the purpose of advancing intersectional scientific information exchange and discussion of science and technology of plasma materials processing. APCPST and SPSM are jointly held biennially to survey the current status of low temperature and thermal plasma physics and chemistry for industrial applications. The whole area of plasma processing was covered from fundamentals to applications. Previous meetings were held in China, Japan, Korea, and Australia, attended by scientists from the Asia-Pacific and other countries. The joint conference was organized in plenary lectures, invited, contributed oral presentations and poster sessions. At this meeting, we had 386 participants from 10 countries and 398 presentations, including 26 invited presentations. This year, we arranged special topical sessions that covered green innovation, life innovation, and technical reports from industry. This conference seeks to bring the plasma community together and to create a forum for discussing the latest developments and issues, the challenges ahead in the field of plasma research and applications among engineers and scientists in Asia, the Pacific Rim, as well as Europe. This volume presents 44 papers that were selected via a strict peer-review process from full papers submitted for the proceedings of the conference. The topics range from the basic physics and chemistry of plasma processing to a broad variety of materials processing and environmental applications. This volume offers an overview of recent advances in thermal and non-equilibrium plasmas as well as on more new and innovative developments in the field of life innovation, green innovation and a technical report session. The editors hope that this volume will be useful and helpful for deepening our understanding of science and technology of plasma materials processing and also for stimulating further development of the plasma technology. Finally, we would like to thank the conference chairmen, the members of the organizing committee, the advisory committee, the executive committee, the program committee, the publication committee, organizing secretariat and financial support from The 153rd Committee on Plasma Materials Science, JSPS. Sponsors and Supporting Organization: The 153rd Committee on Plasma Materials Science, Japan Society for the Promotion of Science Organizing Committee Chairperson: Osamu Tsuji, SAMCO Corporation, Japan Advisory Committee Chairperson: Akihisa Matsuda, Osaka University, Japan Executive Committee Chairperson: Masaru Hori, Nagoya University, Japan Program Committee Chairperson: Takamasa Ishigaki, Hosei University, Japan Publication Committee Chairperson: Takayuki Watanabe, Kyushu University Editors of APCPST-11 and SPMS-25 Professor Takayuki Watanabe, Kyushu University, Japan Professor Toshio Kaneko, Tohoku University, Japan Professor Makoto Sekine, Nagoya University, Japan Professor Yasunori Tanaka, Kanazawa University, Japan

Recent progress in solution plasma-synthesized-carbon-supported catalysts for energy conversion systems

NASA Astrophysics Data System (ADS)

Lun Li, Oi; Lee, Hoonseung; Ishizaki, Takahiro

2018-01-01

Carbon-based materials have been widely utilized as the electrode materials in energy conversion and storage technologies, such as fuel cells and metal-air batteries. In these systems, the oxygen reduction reaction is an important step that determines the overall performance. A novel synthesis route, named the solution plasma process, has been recently utilized to synthesize various types of metal-based and heteroatom-doped carbon catalysts. In this review, we summarize cutting-edge technologies involving the synthesis and modeling of carbon-supported catalysts synthesized via solution plasma process, followed by current progress on the electrocatalytic performance of these catalysts. This review provides the fundamental and state-of-the-art performance of solution-plasma-synthesized electrode materials, as well as the remaining scientific and technological challenges for this process.

Selective Plasma Etching of Polymeric Substrates for Advanced Applications

PubMed Central

Puliyalil, Harinarayanan; Cvelbar, Uroš

2016-01-01

In today’s nanoworld, there is a strong need to manipulate and process materials on an atom-by-atom scale with new tools such as reactive plasma, which in some states enables high selectivity of interaction between plasma species and materials. These interactions first involve preferential interactions with precise bonds in materials and later cause etching. This typically occurs based on material stability, which leads to preferential etching of one material over other. This process is especially interesting for polymeric substrates with increasing complexity and a “zoo” of bonds, which are used in numerous applications. In this comprehensive summary, we encompass the complete selective etching of polymers and polymer matrix micro-/nanocomposites with plasma and unravel the mechanisms behind the scenes, which ultimately leads to the enhancement of surface properties and device performance. PMID:28335238

Plasma gasification of municipal solid waste

DOE Office of Scientific and Technical Information (OSTI.GOV)

Carter, G.W.; Tsangaris, A.V.

1995-12-31

Resorption Canada Limited (RCL) has conducted extensive operational testing with plasma technology in their plasma facility near Ottawa, Ontario, Canada to develop an environmentally friendly waste disposal process. Plasma technology, when utilized in a reactor vessel with the exclusion of oxygen, provides for the complete gasification of all combustibles in source materials with non-combustibles being converted to a non-hazardous slag. The energy and environmental characteristics of the plasma gasification of carbonaceous waste materials were studied over a period of eight years during which RCL completed extensive experimentation with MSW. A plasma processing system capable of processing 200--400 lbs/hr of MSWmore » was designed and built. The experimentation on MSW concentrated on establishing the optimum operating parameters and determining the energy and environmental characteristics at these operating parameters.« less

Fluorophore-based sensor for oxygen radicals in processing plasmas

DOE Office of Scientific and Technical Information (OSTI.GOV)

Choudhury, Faraz A.; Shohet, J. Leon, E-mail: shohet@engr.wisc.edu; Sabat, Grzegorz

2015-11-15

A high concentration of radicals is present in many processing plasmas, which affects the processing conditions and the properties of materials exposed to the plasma. Determining the types and concentrations of free radicals present in the plasma is critical in order to determine their effects on the materials being processed. Current methods for detecting free radicals in a plasma require multiple expensive and bulky instruments, complex setups, and often, modifications to the plasma reactor. This work presents a simple technique that detects reactive-oxygen radicals incident on a surface from a plasma. The measurements are made using a fluorophore dye thatmore » is commonly used in biological and cellular systems for assay labeling in liquids. Using fluorometric analysis, it was found that the fluorophore reacts with oxygen radicals incident from the plasma, which is indicated by degradation of its fluorescence. As plasma power was increased, the quenching of the fluorescence significantly increased. Both immobilized and nonimmobilized fluorophore dyes were used and the results indicate that both states function effectively under vacuum conditions. The reaction mechanism is very similar to that of the liquid dye.« less

Atmospheric-Pressure Plasma Jet Surface Treatment for Use in Improving Adhesion

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kuettner, Lindsey Ann

Atmospheric-pressure plasma jets (APPJs) are a method of plasma treatment that plays an important role in material processing and modifying surface properties of materials, especially polymers. Gas plasmas react with polymer surfaces in numerous ways such as oxidation, radical formation, degradation, and promotion of cross-linking. Because of this, gas and plasma conditions can be explored for chosen processes to maximize desired properties. The purpose of this study is to investigate plasma parameters in order to modify surface properties for improved adhesion between aluminum and epoxy substrates using two types of adhesives. The background, results to date, and future work willmore » be discussed.« less

Recent progress in plasma-assisted synthesis and modification of 2D materials

NASA Astrophysics Data System (ADS)

Han, Zhao Jun; Murdock, Adrian T.; Seo, Dong Han; Bendavid, Avi

2018-07-01

Plasma represents an important technique for both the synthesis and modification of two-dimensional (2D) materials, owing to the unique plasma-material interactions which can enable effective energy transfer at the nanoscale. Non-equilibrium and non-thermal plasma techniques have been widely applied on various 2D materials, including graphene, silicene, germanene, phosphorene, hexagonal boron nitride (h-BN), and transition metal dichalcogenides such as MoS2 and WS2. Here, we review the recent progress in plasma-assisted synthesis and modification (e.g. functionalisation, doping and etching) of 2D materials and discuss the potential applications of this unique branch of 2D materials. Challenges and future research opportunities in the relevant research field are also discussed. The primary aim of this Review is to provide a better understanding of the plasma-assisted processes and to promote the utilization of 2D materials for advanced electronic, optoelectronic, sensing and energy storage applications.

Process to make structured particles

DOEpatents

Knapp, Angela Michelle; Richard, Monique N; Luhrs, Claudia; Blada, Timothy; Phillips, Jonathan

2014-02-04

Disclosed is a process for making a composite material that contains structured particles. The process includes providing a first precursor in the form of a dry precursor powder, a precursor liquid, a precursor vapor of a liquid and/or a precursor gas. The process also includes providing a plasma that has a high field zone and passing the first precursor through the high field zone of the plasma. As the first precursor passes through the high field zone of the plasma, at least part of the first precursor is decomposed. An aerosol having a second precursor is provided downstream of the high field zone of the plasma and the decomposed first material is allowed to condense onto the second precursor to from structured particles.

Plasma Spray-PVD: A New Thermal Spray Process to Deposit Out of the Vapor Phase

NASA Astrophysics Data System (ADS)

von Niessen, Konstantin; Gindrat, Malko

2011-06-01

Plasma spray-physical vapor deposition (PS-PVD) is a low pressure plasma spray technology recently developed by Sulzer Metco AG (Switzerland). Even though it is a thermal spray process, it can deposit coatings out of the vapor phase. The basis of PS-PVD is the low pressure plasma spraying (LPPS) technology that has been well established in industry for several years. In comparison to conventional vacuum plasma spraying (VPS) or low pressure plasma spraying (LPPS), the new proposed process uses a high energy plasma gun operated at a reduced work pressure of 0.1 kPa (1 mbar). Owing to the high energy plasma and further reduced work pressure, PS-PVD is able to deposit a coating not only by melting the feed stock material which builds up a layer from liquid splats but also by vaporizing the injected material. Therefore, the PS-PVD process fills the gap between the conventional physical vapor deposition (PVD) technologies and standard thermal spray processes. The possibility to vaporize feedstock material and to produce layers out of the vapor phase results in new and unique coating microstructures. The properties of such coatings are superior to those of thermal spray and electron beam-physical vapor deposition (EB-PVD) coatings. In contrast to EB-PVD, PS-PVD incorporates the vaporized coating material into a supersonic plasma plume. Owing to the forced gas stream of the plasma jet, complex shaped parts such as multi-airfoil turbine vanes can be coated with columnar thermal barrier coatings using PS-PVD. Even shadowed areas and areas which are not in the line of sight of the coating source can be coated homogeneously. This article reports on the progress made by Sulzer Metco in developing a thermal spray process to produce coatings out of the vapor phase. Columnar thermal barrier coatings made of Yttria-stabilized Zircona (YSZ) are optimized to serve in a turbine engine. This process includes not only preferable coating properties such as strain tolerance and erosion resistance but also the simultaneous coverage of multiple air foils.

Plasma-Enhanced Deposition and Processing of Transition Metals and Transition Metal Silicides for VLSI.

DTIC Science & Technology

1986-05-20

molybdenum trifluoride in the deposited material. Titanium silicide films formed from a discharge of titanium tetrachlotide, silane, and hydrogen...displayed resistivities of -150 /4-cm, due to small amounts of oxygen and chlorine incorporated during deposition. Plasma etching studies of tungsten films...material, thereby reducing speed, and aluminum is a low melting material, thereby limiting processing latitude. As a result, mmition metals and

Plasma jet printing of electronic materials on flexible and nonconformal objects.

PubMed

Gandhiraman, Ram P; Jayan, Vivek; Han, Jin-Woo; Chen, Bin; Koehne, Jessica E; Meyyappan, M

2014-12-10

We present a novel approach for the room-temperature fabrication of conductive traces and their subsequent site-selective dielectric encapsulation for use in flexible electronics. We have developed an aerosol-assisted atmospheric pressure plasma-based deposition process for efficiently depositing materials on flexible substrates. Silver nanowire conductive traces and silicon dioxide dielectric coatings for encapsulation were deposited using this approach as a demonstration. The paper substrate with silver nanowires exhibited a very low change in resistance upon 50 cycles of systematic deformation, exhibiting high mechanical flexibility. The applicability of this process to print conductive traces on nonconformal 3D objects was also demonstrated through deposition on a 3D-printed thermoplastic object, indicating the potential to combine plasma printing with 3D printing technology. The role of plasma here includes activation of the material present in the aerosol for deposition, increasing the deposition rate, and plasma polymerization in the case of inorganic coatings. The demonstration here establishes a low-cost, high-throughput, and facile process for printing electronic components on nonconventional platforms.

A compact plasma pre-ionized TEA-CO2 laser pulse clipper for material processing

NASA Astrophysics Data System (ADS)

Gasmi, Taieb

2017-08-01

An extra-laser cavity CO2-TEA laser pulse clipper using gas breakdown techniques for high spatial resolution material processing and shallow material engraving and drilling processes is presented. Complete extinction of the nitrogen tail, that extends the pulse width, is obtained at pressures from 375 up to 1500 torr for nitrogen and argon gases. Excellent energy stability and pulse repeatability were further enhanced using high voltage assisted preionized plasma gas technique. Experimental data illustrates the direct correlation between laser pulse width and depth of engraving in aluminum and alumina materials.

Structure and Properties of Sio2 Nanopowder Obtained From High-Silica Raw Materials by Plasma Method

NASA Astrophysics Data System (ADS)

Kosmachev, P. V.; Vlasov, V. A.; Skripnikova, N. K.

2017-06-01

The paper presents a plasma-assisted generation of nanodisperse powder obtained from diatomite, a natural high-silica material. The structure and properties of the obtained material are investigated using the transmission electron microscopy, energy dispersive X-Ray spectroscopy, infrared and X-ray photoelectron spectroscopies, and Brunauer-Emmett-Teller method. It is clearly shown that the obtained SiO2 nanoparticles are spherical, polydisperse and represented in the form of agglomerates. The specific surface of this nanopowder is 32 m2/g. Thermodynamic modeling of the plasma-assisted process is used to obtain the equilibrium compositions of condensed and gaseous reaction products. The plasma process is performed within the 300-5000 K temperature range.

Implementation of a diffusion convection surface evolution model in WallDYN

NASA Astrophysics Data System (ADS)

Schmid, K.

2013-07-01

In thermonuclear fusion experiments with multiple plasma facing materials the formation of mixed materials is inevitable. The formation of these mixed material layers is a dynamic process driven the tight interaction between transport in the plasma scrape off layer and erosion/(re-) deposition at the surface. To track this global material erosion/deposition balance and the resulting formation of mixed material layers the WallDYN code has been developed which couples surface processes and plasma transport. The current surface model in WallDYN cannot fully handle the growth of layers nor does it include diffusion. However at elevated temperatures diffusion is a key process in the formation of mixed materials. To remedy this shortcoming a new surface model has been developed which, for the first time, describes both layer growth/recession and diffusion in a single continuous diffusion/convection equation. The paper will detail the derivation of the new surface model and compare it to TRIDYN calculations.

Etude fondamentale des mecanismes de gravure par plasma de materiaux de pointe: Application a la fabrication de dispositifs photoniques

NASA Astrophysics Data System (ADS)

Stafford, Luc

Advances in electronics and photonics critically depend upon plasma-based materials processing either for transferring small lithographic patterns into underlying materials (plasma etching) or for the growth of high-quality films. This thesis deals with the etching mechanisms of materials using high-density plasmas. The general objective of this work is to provide an original framework for the plasma-material interaction involved in the etching of advanced materials by putting the emphasis on complex oxides such as SrTiO3, (Ba,Sr)TiO 3 and SrBi2Ta2O9 films. Based on a synthesis of the descriptions proposed by different authors to explain the etching characteristics of simple materials in noble and halogenated plasma mixtures, we propose comprehensive rate models for physical and chemical plasma etching processes. These models have been successfully validated using experimental data published in literature for Si, Pt, W, SiO2 and ZnO. As an example, we have been able to adequately describe the simultaneous dependence of the etch rate on ion and reactive neutral fluxes and on the ion energy. From an exhaustive experimental investigation of the plasma and etching properties, we have also demonstrated that the validity of the proposed models can be extended to complex oxides such as SrTiO3, (Ba,Sr)TiO 3 and SrBi2Ta2O9 films. We also reported for the first time physical aspects involved in plasma etching such as the influence of the film microstructural properties on the sputter-etch rate and the influence of the positive ion composition on the ion-assisted desorption dynamics. Finally, we have used our deep investigation of the etching mechanisms of STO films and the resulting excellent control of the etch rate to fabricate a ridge waveguide for photonic device applications. Keywords: plasma etching, sputtering, adsorption and desorption dynamics, high-density plasmas, plasma diagnostics, advanced materials, photonic applications.

Development of a Cr-Based Hard Composite Processed by Spark Plasma Sintering

NASA Astrophysics Data System (ADS)

García-Junceda, A.; Sáez, I.; Deng, X. X.; Torralba, J. M.

2018-04-01

This investigation analyzes the feasibility of processing a composite material comprising WC particles randomly dispersed in a matrix in which Cr is the main metallic binder. Thus, a new composite material is processed using a commercial, economic, and easily available Cr-based alloy, assuming that there is a certain Cr solubility in the WC particles acting as reinforcement. The processing route followed includes mechanical milling of the powders and consolidation by spark plasma sintering.

Investigation of Chemical Processes Involving Laser-generated Nanoenergetic Materials

DTIC Science & Technology

2010-02-01

nanoparticle formation, nanoenergetic materials, laser ablation, plasma chemistry , optical emission 16. SECURITY CLASSIFICATION OF: 17...alloys with known trace metal concentrations. In addition to observing the effect of trace metals on the plasma chemistry , commercially available

DU Processing Efficiency and Reclamation: Plasma Arc Melting

DOE Office of Scientific and Technical Information (OSTI.GOV)

Imhoff, Seth D.; Aikin, Jr., Robert M.; Swenson, Hunter

The work described here corresponds to one piece of a larger effort to increase material usage efficiency during DU processing operations. In order to achieve this goal, multiple technologies and approaches are being tested. These technologies occupy a spectrum of technology readiness levels (TRLs). Plasma arc melting (PAM) is one of the technologies being investigated. PAM utilizes a high temperature plasma to melt materials. Depending on process conditions, there are potential opportunities for recycling and material reclamation. When last routinely operational, the LANL research PAM showed extremely promising results for recycling and reclamation of DU and DU alloys. The currentmore » TRL is lower due to machine idleness for nearly two decades, which has proved difficult to restart. This report describes the existing results, promising techniques, and the process of bringing this technology back to readiness at LANL.« less

Pacifichem 2000 Symposium on Plasma Chemistry and Technology for Green Manufacturing, Pollution Control and Processing Applications

DTIC Science & Technology

2001-03-19

Plasma chemistry and technology represents a significant advance and improvement for green manufacturing, pollution control, and various processing...December 14-19, 2000 in Honolulu, HI. This Congress consists of over 120 symposia. amongst them the Symposium on Plasma Chemistry and Technology for...in the plasma chemistry many field beyond the more traditional and mature fields of semiconductor and materials processing. This symposium was focus on

Carbon materials modified by plasma treatment as electrodes for supercapacitors

NASA Astrophysics Data System (ADS)

Lota, Grzegorz; Tyczkowski, Jacek; Kapica, Ryszard; Lota, Katarzyna; Frackowiak, Elzbieta

The carbon material was modified by RF plasma with various reactive gases: O 2, Ar and CO 2. Physicochemical properties of the final carbon products were characterized using different techniques such as gas adsorption method and XPS. Plasma modified materials enriched in oxygen functionalities were investigated as electrodes for supercapacitors in acidic medium. The electrochemical measurements have been carried out using cyclic voltammetry, galvanostatic charge/discharge and impedance spectroscopy. The electrochemical measurements have confirmed that capacity characteristics are closely connected with a type of plasma exposition. Modification processes have an influence on the kind and amount of surface functional groups in the carbon matrix. The moderate increase of capacity of carbon materials modified by plasma has been observed using symmetric two-electrode systems. Whereas investigations made in three-electrode system proved that the suitable selection of plasma modification parameters allows to obtain promising negative and positive electrode materials for supercapacitor application.

Chlorination processing of local planetary ores for oxygen and metallurgically important metals

NASA Technical Reports Server (NTRS)

Lynch, D. C.

1989-01-01

The use of chlorine to extract, reclaim, and purify metals has attractive possibilities for extraterrestrial processing of local planetary resources. While a complete cyclic process has been proposed for the recovery of metallurgically significant metals and oxygen, herein the chlorination step of the cycle is examined. An experimental apparatus for reacting refractory materials, such as ilmenite, in a microwave induced plasma is being built. Complex equilibria calculations reveal that stable refractory materials can, under the influence of a plasma, undergo chlorination and yield oxygen as a by-product. These issues and the potential advantages for plasma processing in space are reviewed. Also presented is a discussion of the complex equilibria program used in the analysis.

Potential Alternatives for Advanced Energy Material Processing in High Performance Li-ion Batteries (LIBs) via Atmospheric Pressure Plasma Treatment

NASA Astrophysics Data System (ADS)

Duh, Jenq-Gong; Chuang, Shang-I.; Lan, Chun-Kai; Yang, Hao; Chen, Hsien-Wei

2015-09-01

A new processing technique by atmospheric pressure plasma (APP) jet treatment of LIBs was introduced. Ar/N2 plasma enhanced the high-rate anode performance of Li4Ti5O12. Oxygen vacancies were discovered and nitrogen doping were achieved by the surface reaction between pristine Li4Ti5O12 and plasma reactive species (N* and N2+). Electrochemical impedance spectra confirm that plasma modification increases Li ions diffusivity and reduces internal charge-transfer resistance, leading to a superior capacity (132 mAh/g) and excellent stability with negligible capacity decay over 100 cycles under 10C rate. Besides 2D material surface treatment, a specially designed APP generator that are feasible to modify 3D TiO2 powders is proposed. The rate capacity of 20 min plasma treated TiO2 exhibited 20% increment. Plasma diagnosis revealed that excited Ar and N2 was contributed to TiO2 surface reduction as companied by formation of oxygen vacancy. A higher amount of oxygen vacancy increased the chance for excited nitrogen doped onto surface of TiO2 particle. These findings promote the understanding of APP on processing anode materials in high performance LIBs.

Surface energy modification for biomedical material by corona streamer plasma processing to mitigate bacterial adhesion

NASA Astrophysics Data System (ADS)

Alhamarneh, Ibrahim; Pedrow, Patrick

2011-10-01

Bacterial adhesion initiates biofouling of biomedical material but the processes can be reduced by adjusting the material's surface energy. The surface of surgical-grade 316L stainless steel (316L SS) had its hydrophilic property enhanced by processing in a corona streamer plasma reactor using atmospheric pressure Ar mixed with O2. Reactor excitation was 60 Hz ac high-voltage (<= 10 kV RMS) applied to a multi-needle-to-grounded-torus electrode configuration. Applied voltage and streamer current pulses were monitored with a broadband sensor system. When Ar/O2 plasma was used, the surface energy was enhanced more than with Ar plasma alone. Composition of the surface before and after plasma treatment was characterized by XPS. As the hydrophilicity of the treated surface increased so did percent of oxygen on the surface thus we concluded that reduction in contact angle was mainly due to new oxygen-containing functionalities. FTIR was used to identify oxygen containing groups on the surface. The aging effect that accompanies surface free energy adjustments was also observed.

Diagnostic for Plasma Enhanced Chemical Vapor Deposition and Etch Systems

NASA Technical Reports Server (NTRS)

Cappelli, Mark A.

1999-01-01

In order to meet NASA's requirements for the rapid development and validation of future generation electronic devices as well as associated materials and processes, enabling technologies ion the processing of semiconductor materials arising from understanding etch chemistries are being developed through a research collaboration between Stanford University and NASA-Ames Research Center, Although a great deal of laboratory-scale research has been performed on many of materials processing plasmas, little is known about the gas-phase and surface chemical reactions that are critical in many etch and deposition processes, and how these reactions are influenced by the variation in operating conditions. In addition, many plasma-based processes suffer from stability and reliability problems leading to a compromise in performance and a potentially increased cost for the semiconductor manufacturing industry. Such a lack of understanding has hindered the development of process models that can aid in the scaling and improvement of plasma etch and deposition systems. The research described involves the study of plasmas used in semiconductor processes. An inductively coupled plasma (ICP) source in place of the standard upper electrode assembly of the Gaseous Electronics Conference (GEC) radio-frequency (RF) Reference Cell is used to investigate the discharge characteristics and chemistries. This ICP source generates plasmas with higher electron densities (approximately 10(exp 12)/cu cm) and lower operating pressures (approximately 7 mTorr) than obtainable with the original parallel-plate version of the GEC Cell. This expanded operating regime is more relevant to new generations of industrial plasma systems being used by the microelectronics industry. The motivation for this study is to develop an understanding of the physical phenomena involved in plasma processing and to measure much needed fundamental parameters, such as gas-phase and surface reaction rates. species concentration, temperature, ion energy distribution, and electron number density. A wide variety of diagnostic techniques are under development through this consortium grant to measure these parameters. including molecular beam mass spectrometry (MBMS). Fourier transform infrared (FTIR) spectroscopy, broadband ultraviolet (UV) absorption spectroscopy, a compensated Langmuir probe. Additional diagnostics. Such as microwave interferometry and microwave absorption for measurements of plasma density and radical concentrations are also planned.

Plasma-assisted conversion of solid hydrocarbon to diamond

DOEpatents

Valone, Steven M.; Pattillo, Stevan G.; Trkula, Mitchell; Coates, Don M.; Shah, S. Ismat

1996-01-01

A process of preparing diamond, e.g., diamond fiber, by subjecting a hydrocarbon material, e.g., a hydrocarbon fiber, to a plasma treatment in a gaseous feedstream for a sufficient period of time to form diamond, e.g., a diamond fiber is disclosed. The method generally further involves pretreating the hydrocarbon material prior to treatment with the plasma by heating within an oxygen-containing atmosphere at temperatures sufficient to increase crosslinking within said hydrocarbon material, but at temperatures insufficient to melt or decompose said hydrocarbon material, followed by heating at temperatures sufficient to promote outgassing of said crosslinked hydrocarbon material, but at temperatures insufficient to convert said hydrocarbon material to carbon.

Plasma methods for metals recovery from metal-containing waste.

PubMed

Changming, Du; Chao, Shang; Gong, Xiangjie; Ting, Wang; Xiange, Wei

2018-04-27

Metal-containing waste, a kind of new wastes, has a great potential for recycling and is also difficult to deal with. Many countries pay more and more attention to develop the metal recovery process and equipment of this kind of waste as raw material, so as to solve the environmental pollution and comprehensively utilize the discarded metal resources. Plasma processing is an efficient and environmentally friendly way for metal-containing waste. This review mainly discuss various metal-containing waste types, such as printed circuit boards (PCBs), red mud, galvanic sludge, Zircon, aluminium dross and incinerated ash, and the corresponding plasma methods, which include DC extended transferred arc plasma reactor, DC non-transferred arc plasma torch, RF thermal plasma reactor and argon and argon-hydrogen plasma jets. In addition, the plasma arc melting technology has a better purification effect on the extraction of useful metals from metal-containing wastes, a great capacity of volume reduction of waste materials, and a low leaching toxicity of solid slag, which can also be used to deal with all kinds of metal waste materials, having a wide range of applications. Copyright © 2018 Elsevier Ltd. All rights reserved.

Sterilization by oxygen plasma

NASA Astrophysics Data System (ADS)

Moreira, Adir José; Mansano, Ronaldo Domingues; Andreoli Pinto, Terezinha de Jesus; Ruas, Ronaldo; Zambon, Luis da Silva; da Silva, Mônica Valero; Verdonck, Patrick Bernard

2004-07-01

The use of polymeric medical devices has stimulated the development of new sterilization methods. The traditional techniques rely on ethylene oxide, but there are many questions concerning the carcinogenic properties of the ethylene oxide residues adsorbed on the materials after processing. Another common technique is the gamma irradiation process, but it is costly, its safe operation requires an isolated site and it also affects the bulk properties of the polymers. The use of a gas plasma is an elegant alternative sterilization technique. The plasma promotes an efficient inactivation of the micro-organisms, minimises the damage to the materials and presents very little danger for personnel and the environment. Pure oxygen reactive ion etching type of plasmas were applied to inactivate a biologic indicator, the Bacillus stearothermophilus, to confirm the efficiency of this process. The sterilization processes took a short time, in a few minutes the mortality was complete. In situ analysis of the micro-organisms' inactivating time was possible using emission spectrophotometry. The increase in the intensity of the 777.5 nm oxygen line shows the end of the oxidation of the biologic materials. The results were also observed and corroborated by scanning electron microscopy.

Solution plasma applications for the synthesis/modification of inorganic nanostructured materials and the treatment of natural polymers

NASA Astrophysics Data System (ADS)

Watthanaphanit, Anyarat; Saito, Nagahiro

2018-01-01

Reducing the use of toxic chemicals, production steps, and time consumption are important concerns for researchers and process engineers to contribute in the quest for an efficient process in any production. If an equipment setup is simple, the process additionally becomes more profitable. Combination of the mentioned requirements has opened up various applications of the solution plasma process (SPP) — a physical means of generating plasma through an electrical discharge in a liquid medium at atmospheric pressure and room temperature. This review shows the progress of scientific research on the applications of the SPP for the synthesis/modification of inorganic nanostructured materials and the treatment of natural polymers. Development achieved in each application is demonstrated.

In situ measurement of plasma and shock wave properties inside laser-drilled metal holes

NASA Astrophysics Data System (ADS)

Brajdic, Mihael; Hermans, Martin; Horn, Alexander; Kelbassa, Ingomar

2008-10-01

High-speed imaging of shock wave and plasma dynamics is a commonly used diagnostic method for monitoring processes during laser material treatment. It is used for processes such as laser ablation, cutting, keyhole welding and drilling. Diagnosis of laser drilling is typically adopted above the material surface because lateral process monitoring with optical diagnostic methods inside the laser-drilled hole is not possible due to the hole walls. A novel method is presented to investigate plasma and shock wave properties during the laser drilling inside a confined environment such as a laser-drilled hole. With a novel sample preparation and the use of high-speed imaging combined with spectroscopy, a time and spatial resolved monitoring of plasma and shock wave dynamics is realized. Optical emission of plasma and shock waves during drilling of stainless steel with ns-pulsed laser radiation is monitored and analysed. Spatial distributions and velocities of shock waves and of plasma are determined inside the holes. Spectroscopy is accomplished during the expansion of the plasma inside the drilled hole allowing for the determination of electron densities.

Method to Improve Indium Bump Bonding via Indium Oxide Removal Using a Multi-Step Plasma Process

NASA Technical Reports Server (NTRS)

Dickie, Matthew R. (Inventor); Nikzad, Shouleh (Inventor); Greer, H. Frank (Inventor); Jones, Todd J. (Inventor); Vasquez, Richard P. (Inventor); Hoenk, Michael E. (Inventor)

2012-01-01

A process for removing indium oxide from indium bumps in a flip-chip structure to reduce contact resistance, by a multi-step plasma treatment. A first plasma treatment of the indium bumps with an argon, methane and hydrogen plasma reduces indium oxide, and a second plasma treatment with an argon and hydrogen plasma removes residual organics. The multi-step plasma process for removing indium oxide from the indium bumps is more effective in reducing the oxide, and yet does not require the use of halogens, does not change the bump morphology, does not attack the bond pad material or under-bump metallization layers, and creates no new mechanisms for open circuits.

Computation of Electron Impact Ionization Cross sections of Iron Hydrogen Clusters - Relevance in Fusion Plasmas

NASA Astrophysics Data System (ADS)

Patel, Umang; Joshipura, K. N.

2017-04-01

Plasma-wall interaction (PWI) is one of the key issues in nuclear fusion research. In nuclear fusion devices, such as the JET tokamak or the ITER, first-wall materials will be directly exposed to plasma components. Erosion of first-wall materials is a consequence of the impact of hydrogen and its isotopes as main constituents of the hot plasma. Besides the formation of gas-phase atomic species in various charge states, di- and polyatomic molecular species are expected to be formed via PWI processes. These compounds may profoundly disturb the fusion plasma, may lead to unfavorable re-deposition of materials and composites in other areas of the vessel. Interaction between atoms, molecules as well transport of impurities are of interest for modelling of fusion plasma. Qion by electron impact are such process also important in low temperature plasma processing, astrophysics etc. We reported electron impact Qionfor iron hydrogen clusters, FeHn (n = 1 to 10) from ionization threshold to 2000 eV. A semi empirical approach called Complex Scattering Potential - Ionization Contribution (CSP-ic) has been employed for the reported calculation. In context of fusion relevant species Qion were reported for beryllium and its hydrides, tungsten and its oxides and cluster of beryllium-tungsten by Huber et al.. Iron hydrogen clusters are another such species whose Qion were calculated through DM and BEB formalisms, same has been compared with present calculations.

The cathode material for a plasma-arc heater

NASA Astrophysics Data System (ADS)

Yelyutin, A. V.; Berlin, I. K.; Averyanov, V. V.; Kadyshevskii, V. S.; Savchenko, A. A.; Putintseva, R. G.

1983-11-01

The cathode of a plasma arc heater experiences a large thermal load. The temperature of its working surface, which is in contact with the plasma, reaches high values, as a result of which the electrode material is subject to erosion. Refractory metals are usually employed for the cathode material, but because of the severe erosion do not usually have a long working life. The most important electrophysical characteristic of the electrode is the electron work function. The use of materials with a low electron work function allows a decrease in the heat flow to the cathode, and this leads to an increase in its erosion resistance and working life. The electroerosion of certain materials employed for the cathode in an electric arc plasma generator in the process of reduction smelting of refractory metals was studied.

Plasma-surface interaction in the Be/W environment: Conclusions drawn from the JET-ILW for ITER

NASA Astrophysics Data System (ADS)

Brezinsek, S.; JET-EFDA contributors

2015-08-01

The JET ITER-Like Wall experiment (JET-ILW) provides an ideal test bed to investigate plasma-surface interaction (PSI) and plasma operation with the ITER plasma-facing material selection employing beryllium in the main chamber and tungsten in the divertor. The main PSI processes: material erosion and migration, (b) fuel recycling and retention, (c) impurity concentration and radiation have be1en studied and compared between JET-C and JET-ILW. The current physics understanding of these key processes in the JET-ILW revealed that both interpretation of previously obtained carbon results (JET-C) and predictions to ITER need to be revisited. The impact of the first-wall material on the plasma was underestimated. Main observations are: (a) low primary erosion source in H-mode plasmas and reduction of the material migration from the main chamber to the divertor (factor 7) as well as within the divertor from plasma-facing to remote areas (factor 30 - 50). The energetic threshold for beryllium sputtering minimises the primary erosion source and inhibits multi-step re-erosion in the divertor. The physical sputtering yield of tungsten is low as 10-5 and determined by beryllium ions. (b) Reduction of the long-term fuel retention (factor 10 - 20) in JET-ILW with respect to JET-C. The remaining retention is caused by implantation and co-deposition with beryllium and residual impurities. Outgassing has gained importance and impacts on the recycling properties of beryllium and tungsten. (c) The low effective plasma charge (Zeff = 1.2) and low radiation capability of beryllium reveal the bare deuterium plasma physics. Moderate nitrogen seeding, reaching Zeff = 1.6 , restores in particular the confinement and the L-H threshold behaviour. ITER-compatible divertor conditions with stable semi-detachment were obtained owing to a higher density limit with ILW. Overall JET demonstrated successful plasma operation in the Be/W material combination and confirms its advantageous PSI behaviour and gives strong support to the ITER material selection.

Investigation of some process parameters using microwave plasma technology for the treatment of radioactive waste

NASA Astrophysics Data System (ADS)

Trnovcevic, J.; Schneider, F.; Scherer, U. W.

2017-02-01

The production of nuclear energy and the application of other nuclear technologies produce large volumes of low- and intermediate-level radioactive wastes. To investigate a novel means of treating such wastes, plasma is investigated for its efficacy. Plasma treatment promises to simultaneously treat all waste types without any previous sorting or pre-treatment. Microwave-driven plasma torches have the advantage of high-energy efficiency and low-electrode wear. In small-scale experiments, several design variations of an open plasma oven were assembled in order to investigate constraints caused by the materials and oven geometry. The experimental set-up was modified several times in order to test the design characteristics and the variation of plasma-specific proprieties related to the radioactive waste treatment and in order to find a suitable solution with the minimum complexity that allows a representative reproducibility of the results obtained. A plasma torch controlled by a 2.45 GHz microwave signal of up to 200 W was used, employing air as the primary plasma gas with a flow rate of ∼2 L/min. Different organic and inorganic materials in different shapes and sizes were treated besides a standardized mixture resembling mixed wastes from nuclear plants. The results prove that the chosen microwave plasma torch is suitable for a combined combustion and melting of organic and in-organic materials. Investigation of the specimen size to be treated is influential in this process: the power is still too low to melt larger samples, but the temperature is sufficient to treat all kinds of material. When glass particles are added, materials melt together to form an amorphous substance, proving the possibility to vitrify material with this plasma torch. By optimization of the oven configuration, the time needed to combust 25 g of standard sample was reduced by ∼50%. Typical energy efficiencies were found in the range of 8-20% for melting of metal chipping, and ∼90% for melting of zinc powder.

Chlorine-rich plasma polymer coating for the prevention of attachment of pathogenic fungal cells onto materials surfaces

NASA Astrophysics Data System (ADS)

Lamont-Friedrich, Stephanie J.; Michl, Thomas D.; Giles, Carla; Griesser, Hans J.; Coad, Bryan R.

2016-07-01

The attachment of pathogenic fungal cells onto materials surfaces, which is often followed by biofilm formation, causes adverse consequences in a wide range of areas. Here we have investigated the ability of thin film coatings from chlorinated molecules to deter fungal colonization of solid materials by contact killing of fungal cells reaching the surface of the coating. Coatings were deposited onto various substrate materials via plasma polymerization, which is a substrate-independent process widely used for industrial coating applications, using 1,1,2-trichloroethane as the process vapour. XPS surface analysis showed that the coatings were characterized by a highly chlorinated hydrocarbon polymer nature, with only a very small amount of oxygen incorporated. The activity of these coatings against human fungal pathogens was quantified using a recently developed, modified yeast assay and excellent antifungal activity was observed against Candida albicans and Candida glabrata. Plasma polymer surface coatings derived from chlorinated hydrocarbon molecules may therefore offer a promising solution to preventing yeast and mould biofilm formation on materials surfaces, for applications such as air conditioners, biomedical devices, food processing equipment, and others.

Atomic precision etch using a low-electron temperature plasma

NASA Astrophysics Data System (ADS)

Dorf, L.; Wang, J.-C.; Rauf, S.; Zhang, Y.; Agarwal, A.; Kenney, J.; Ramaswamy, K.; Collins, K.

2016-03-01

Sub-nm precision is increasingly being required of many critical plasma etching processes in the semiconductor industry. Accurate control over ion energy and ion/radical composition is needed during plasma processing to meet these stringent requirements. Described in this work is a new plasma etch system which has been designed with the requirements of atomic precision plasma processing in mind. In this system, an electron sheet beam parallel to the substrate surface produces a plasma with an order of magnitude lower electron temperature Te (~ 0.3 eV) and ion energy Ei (< 3 eV without applied bias) compared to conventional radio-frequency (RF) plasma technologies. Electron beam plasmas are characterized by higher ion-to-radical fraction compared to RF plasmas, so a separate radical source is used to provide accurate control over relative ion and radical concentrations. Another important element in this plasma system is low frequency RF bias capability which allows control of ion energy in the 2-50 eV range. Presented in this work are the results of etching of a variety of materials and structures performed in this system. In addition to high selectivity and low controllable etch rate, an important requirement of atomic precision etch processes is no (or minimal) damage to the remaining material surface. It has traditionally not been possible to avoid damage in RF plasma processing systems, even during atomic layer etch. The experiments for Si etch in Cl2 based plasmas in the aforementioned etch system show that damage can be minimized if the ion energy is kept below 10 eV. Layer-by-layer etch of Si is also demonstrated in this etch system using electrical and gas pulsing.

Diagnostics of cathode material loss in cutting plasma torch

NASA Astrophysics Data System (ADS)

Gruber, J.; Šonský, J.; Hlína, J.

2014-07-01

A cutting plasma torch was observed in several ways by a high-speed camera with a focus on the cathode area. In the first experiment, the plasma arc between the nozzle tip and anode was recorded in a series of duty cycles ranging from new unworn cathodes to cathode failure due to wear and material loss. In the second experiment, we used a specially modified nozzle to observe the inside area between the cathode and the nozzle exit through a fused silica window. Finally, using tilted view, we observed a pool of molten hafnium at the cathode tip during the plasma torch operation. The process of cathode material melting, droplet formation, their expulsion and rate of cathode material loss was examined.

Researching the Possibility of Creating Highly Effective Catalysts for the Thermochemical Heat Regeneration and Hydrocarbon Reforming

DTIC Science & Technology

2006-11-01

PHYSICAL PROPERTIES OF THE PLASMA SPRAYING PROCESS The sprayed -on material is formed by gradual deposition of separate discretely solidifying with great... deposition processes and their ecological purity. Essentially, the method of ion-plasma spraying is evaporation of a metal (or alloy ) atoms from the...29 5.1 PHYSICAL PROPERTIES OF THE PLASMA SPRAYING PROCESS ...................34 6. CATALYST SUPPORTERS FOR THE 1ST STAGE OF

Nanocarbon materials fabricated using plasmas

NASA Astrophysics Data System (ADS)

Hatakeyama, Rikizo

2017-12-01

Since the discovery of fullerenes more than three decades ago, new kinds of nanoscale materials of carbon allotropes called "nanocarbons" have so far been discovered or synthesized at successive intervals as cases such as carbon nanotubes, carbon nanohorns, graphene, carbon nanowalls, and a carbon nanobelt, while nanodiamonds were actually discovered before then. Their attractively excellent mechanical, physical, and chemical properties have driven researchers to continuously create one of the hottest frontiers in materials science and technology. While plasma states have often been involved in their discovery, on the other hand, plasma-based approaches to this exciting field originally hold promising and enormous potentials for advancing and expanding industrial/biomedical applications of nanocarbons of great diversity. This article provides an extensive overview on plasma-fabricated nanocarbon materials, where the term "fabrication" is defined as synthesis, functionalization, and assembly of devices to cover a wide range of issues associated with the step-by-step plasma processes. Specific attention has been paid to the comparative examination between plasma-based and non-plasma methods for fabricating the nanocarobons with an emphasis on the advantages of plasma processing, such as low-temperature/large-scale fabrication and diversity-carrying structure controllability. The review ends with current challenges and prospects including a ripple effect of the nanocarbon studies on the development of related novel nanomaterials such as transition metal dichalcogenides. It contains not only the latest progress in the field for cutting-edge scientists and engineers, but also the introductory guidance to non-specialists such as lower-class graduate students.

Plasma wall interaction, a key issue on the way to a steady state burning fusion device

NASA Astrophysics Data System (ADS)

Philipps, V.

2006-04-01

The International Tokamak Experimental Reactor (ITER), the first burning fusion plasma experiment based on the tokamak principle, is ready for construction. It is based on many years of fusion research resulting in a robust design in most of the areas. Present day fusion research concentrates on the remaining critical issues which are, to a large extent, connected with processes of plasma wall interaction. This is mainly due to extended duty cycle and the increase of the plasma stored energy in comparison with present-day machines. Critical topics are the lifetime of the plasma facing components (PFC) and the long-term tritium retention. These processes are controlled mainly by material erosion, both during steady state operation and transient power losses (disruptions and edge localized modes (ELMs)) and short- and long-range material migration and re-deposition. The extrapolation from present-day 'full carbon wall' devices suggests that the long-term tritium retention in a burning fusion device would be unacceptably high under these conditions allowing for only an unacceptable limited number of pulses in a D T mixture. As a consequence of this, research activities have been strengthened to understand in more detail the underlying processes of material erosion and re-deposition, to develop methods to remove retained tritium from the PFCs and remote areas of a fusion device and to explore these processes and the plasma performance in more detail with metallic PFC, such as beryllium (Be) and tungsten (W), which are foreseen for the ITER experiment. This paper outlines the main physical mechanisms leading to material erosion, migration and re-deposition and the associated fuel retention. It addresses the experimental database in these areas and describes the further research strategies that will be needed to tackle critical issues.

Global modeling of wall material migration following boronization in NSTX-U

NASA Astrophysics Data System (ADS)

Nichols, J. H.; Jaworski, M. A.; Skinner, C. H.; Bedoya, F.; Scotti, F.; Soukhanovskii, V. A.; Schmid, K.

2017-10-01

NSTX-U operated in 2016 with graphite plasma facing components, periodically conditioned with boron to improve plasma performance. Following each boronization, spectroscopic diagnostics generally observed a decrease in oxygen influx from the walls, and an in-vacuo material probe (MAPP) observed a corresponding decrease in surface oxygen concentration at the lower divertor. However, oxygen levels tended to return to a pre-boronization state following repeated plasma exposure. This behavior is interpretively modeled using the WallDYN mixed-material migration code, which couples local erosion and deposition processes with plasma impurity transport in a non-iterative, self-consistent manner that maintains overall material balance. A spatially inhomogenous model of the thin films produced by the boronization process is presented. Plasma backgrounds representative of NSTX-U conditions are reconstructed from a combination of NSTX-U and NSTX datasets. Low-power NSTX-U fiducial discharges, which led to less apparent surface degradation than normal operations, are also modeled with WallDYN. Likely mechanisms driving the observed evolution of surface oxygen are examined, as well as remaining discrepancies between model and experiment and potential improvements to the model. Work supported by US DOE contract DE-AC02-09CH11466.

Design and fabrication of a glovebox for the Plasma Hearth Process radioactive bench-scale system

DOE Office of Scientific and Technical Information (OSTI.GOV)

Wahlquist, D.R.

This paper presents some of the design considerations and fabrication techniques for building a glovebox for the Plasma Hearth Process (PHP) radioactive bench-scale system. The PHP radioactive bench-scale system uses a plasma torch to process a variety of radioactive materials into a final vitrified waste form. The processed waste will contain plutonium and trace amounts of other radioactive materials. The glovebox used in this system is located directly below the plasma chamber and is called the Hearth Handling Enclosure (HHE). The HHE is designed to maintain a confinement boundary between the processed waste and the operator. Operations that take placemore » inside the HHE include raising and lowering the hearth using a hydraulic lift table, transporting the hearth within the HHE using an overhead monorail and hoist system, sampling and disassembly of the processed waste and hearth, weighing the hearth, rebuilding a hearth, and sampling HEPA filters. The PHP radioactive bench-scale system is located at the TREAT facility at Argonne National Laboratory-West in Idaho Falls, Idaho.« less

A Survey of Plasmas and Their Applications

NASA Technical Reports Server (NTRS)

Eastman, Timothy E.; Grabbe, C. (Editor)

2006-01-01

Plasmas are everywhere and relevant to everyone. We bath in a sea of photons, quanta of electromagnetic radiation, whose sources (natural and artificial) are dominantly plasma-based (stars, fluorescent lights, arc lamps.. .). Plasma surface modification and materials processing contribute increasingly to a wide array of modern artifacts; e.g., tiny plasma discharge elements constitute the pixel arrays of plasma televisions and plasma processing provides roughly one-third of the steps to produce semiconductors, essential elements of our networking and computing infrastructure. Finally, plasmas are central to many cutting edge technologies with high potential (compact high-energy particle accelerators; plasma-enhanced waste processors; high tolerance surface preparation and multifuel preprocessors for transportation systems; fusion for energy production).

Atmospheric pressure plasma processing of polymeric materials utilizing close proximity indirect exposure

DOEpatents

Paulauskas, Felix L.; Bonds, Truman

2016-09-20

A plasma treatment method that includes providing treatment chamber including an intermediate heating volume and an interior treatment volume. The interior treatment volume contains an electrode assembly for generating a plasma and the intermediate heating volume heats the interior treatment volume. A work piece is traversed through the treatment chamber. A process gas is introduced to the interior treatment volume of the treatment chamber. A plasma is formed with the electrode assembly from the process gas, wherein a reactive species of the plasma is accelerated towards the fiber tow by flow vortices produced in the interior treatment volume by the electrode assembly.

Integration of process diagnostics and three dimensional simulations in thermal spraying

NASA Astrophysics Data System (ADS)

Zhang, Wei

Thermal spraying is a group of processes in which the metallic or ceramic materials are deposited in a molten or semi-molten state on a prepared substrate. In atmospheric plasma spray process, a thermal plasma jet is used to heat up and accelerate loading particles. The process is inherently complex due to the deviation from equilibrium conditions, three dimensional nature, multitude of interrelated variables involved, and stochastic variability at different stages. This dissertation is aimed at understanding the in-flight particle state and plasma plume characteristics in atmospheric plasma spray process through the integration of process diagnostics and three-dimensional simulation. Effects of injection angle and carrier gas flow rate on in-flight particle characteristics are studied experimentally and interpreted through numerical simulation. Plasma jet perturbation by particle injection angle, carrier gas, and particle loading are also identified. Maximum particle average temperature and velocity at any given spray distance is systematically quantified. Optimum plasma plume position for particle injection which was observed in experiments was verified numerically along with description of physical mechanisms. Correlation of spray distance with in-flight particle behavior for various kinds of materials is revealed. A new strategy for visualization and representation of particle diagnostic results for thermal spray processes has been presented. Specifically, 1 st order process maps (process-particle interactions) have been addressed by converting the Temperature-Velocity of particles obtained via diagnostics into non-dimensional group parameters [Melting Index-Reynolds number]. This approach provides an improved description of the thermal and kinetic energy of particles and allows for cross-comparison of diagnostic data within a given process for different materials, comparison of a single material across different thermal spray processes, and detailed assessment of the melting behavior through recourse to analysis of the distributions. An additional group parameter, Oxidation Index, has been applied to relatively track the oxidation extent of metallic particles under different operating conditions. The new mapping strategies have also been proposed in circumstances where only ensemble particle diagnostics are available. Through the integration of process diagnostics and numerical simulation, key issues concerning in-flight particle status as well as the controlling physical mechanisms have been analyzed. A scientific and intellectual strategy for universal description of particle characteristics has been successfully developed.

Research Activities at Plasma Research Laboratory at NASA Ames Research Center

NASA Technical Reports Server (NTRS)

Sharma, S. P.; Rao, M. V. V. S.; Meyyappan, Meyya

2000-01-01

In order to meet NASA's requirements for the rapid development and validation of future generation electronic devices as well as associated materials and processes, enabling technologies are being developed at NASA-Ames Research Center using a multi-discipline approach. The first step is to understand the basic physics of the chemical reactions in the area of plasma reactors and processes. Low pressure glow discharges are indispensable in the fabrication of microelectronic circuits. These plasmas are used to deposit materials and also etch fine features in device fabrication. However, many plasma-based processes suffer from stability and reliability problems leading to a compromise in performance and a potentially increased cost for the semiconductor manufacturing industry. Although a great deal of laboratory-scale research has been performed on many of these processing plasmas, little is known about the gas-phase and surface chemical reactions that are critical in many etch and deposition processes, and how these reactions are influenced by the variation in operating conditions. Such a lack of understanding has hindered the development of process models that can aid in the scaling and improvement of plasma etch and deposition systems. Our present research involves the study of such plasmas. An inductively-coupled plasma (ICP) source in place of the standard upper electrode assembly of the Gaseous Electronics Conference (GEC) radio-frequency (RF) Reference Cell is used to investigate the discharge characteristics. This ICP source generates plasmas with higher electron densities and lower operating pressures than obtainable with the original parallel-plate version of the GEC Cell. This expanded operating regime is more relevant to new generations of industrial plasma systems being used by the microelectronics industry. The research goal is to develop an understanding of the physical phenomena involved in plasma processing and to measure much needed fundamental parameters, such as gas phase and surface reaction rates, species concentration, temperature, ion energy distribution, and electron number density.

Studies of the influence of nonequilibrium plasma thermal exposure on the characteristics of the capillary-porous polymer material

NASA Astrophysics Data System (ADS)

Makhotkina, L. Yu; Khristoliubova, V. I.

2017-01-01

Capillary-porous materials, which include natural macromolecular tanning material, are exposed to a number of factors during the treatment by a nonequilibrium plasma. Plasma particles exchange the charge and energy with the atoms of the material during the interaction of the plasma with the surface. The results of treatment are desorption of atoms and molecules from the body surface, sputtering and evaporation of material’s particles, changes of the structure and phase state. In real terms during the modification of solids by nonequilibrium low-temperature plasma thermal effect influences the process. The energy supplied from the discharge during the process with low pressure, which is converted into heat, is significantly less than during the atmospheric pressure, but the thermal stability of high-molecular compounds used in the manufacture of materials and products of the tanning industry, is very limited and depends on the duration of the effect of temperature. Even short heating of hydrophilic polymers (proteins) (100-180 °C) causes a change in their properties. It decreases the collagen ability to absorb water vapor, to swell in water, acids, alkalis, and thus decreases their durability. Prolonged heating leads to a deterioration of the physical and mechanical properties. Higher heating temperatures it leads to the polymer degradation. The natural leather temperature during plasma exposure does not rise to a temperature of collagen degradation and does not result in changes of physical phase of the dermis. However, the thermal plasma exposure must be considered, since the high temperatures influence on physical and mechanical properties.

Plasma heating for containerless and microgravity materials processing

NASA Technical Reports Server (NTRS)

Leung, Emily W. (Inventor); Man, Kin F. (Inventor)

1994-01-01

A method for plasma heating of levitated samples to be used in containerless microgravity processing is disclosed. A sample is levitated by electrostatic, electromagnetic, aerodynamic, or acoustic systems, as is appropriate for the physical properties of the particular sample. The sample is heated by a plasma torch at atmospheric pressure. A ground plate is provided to help direct the plasma towards the sample. In addition, Helmholtz coils are provided to produce a magnetic field that can be used to spiral the plasma around the sample. The plasma heating system is oriented such that it does not interfere with the levitation system.

Titanium nitride plasma-chemical synthesis with titanium tetrachloride raw material in the DC plasma-arc reactor

NASA Astrophysics Data System (ADS)

Kirpichev, D. E.; Sinaiskiy, M. A.; Samokhin, A. V.; Alexeev, N. V.

2017-04-01

The possibility of plasmochemical synthesis of titanium nitride is demonstrated in the paper. Results of the thermodynamic analysis of TiCl4 - H2 - N2 system are presented; key parameters of TiN synthesis process are calculated. The influence of parameters of plasma-chemical titanium nitride synthesis process in the reactor with an arc plasmatron on characteristics on the produced powders is experimentally investigated. Structure, chemical composition and morphology dependencies on plasma jet enthalpy, stoichiometric excess of hydrogen and nitrogen in a plasma jet are determined.

Method And Apparatus For Launching Microwave Energy Into A Plasma Processing Chamber

DOEpatents

DOUGHTY, FRANK C.; [et al

2001-05-01

A method and apparatus for launching microwave energy to a plasma processing chamber in which the required magnetic field is generated by a permanent magnet structure and the permanent magnet material effectively comprises one or more surfaces of the waveguide structure. The waveguide structure functions as an impedance matching device and controls the field pattern of the launched microwave field to create a uniform plasma. The waveguide launcher may comprise a rectangular waveguide, a circular waveguide, or a coaxial waveguide with permanent magnet material forming the sidewalls of the guide and a magnetization pattern which produces the required microwave electron cyclotron resonance magnetic field, a uniform field absorption pattern, and a rapid decay of the fields away from the resonance zone. In addition, the incorporation of permanent magnet material as a portion of the waveguide structure places the magnetic material in close proximity to the vacuum chamber, allowing for a precisely controlled magnetic field configuration, and a reduction of the amount of permanent magnet material required.

Environmentally benign semiconductor processing for dielectric etch

NASA Astrophysics Data System (ADS)

Liao, Marci Yi-Ting

Semiconductor processing requires intensive usage of chemicals, electricity, and water. Such intensive resource usage leaves a large impact on the environment. For instance, in Silicon Valley, the semiconductor industry is responsible for 80% of the hazardous waste sites contaminated enough to require government assistance. Research on environmentally benign semiconductor processing is needed to reduce the environmental impact of the semiconductor industry. The focus of this dissertation is on the environmental impact of one aspect of semiconductor processing: patterning of dielectric materials. Plasma etching of silicon dioxide emits perfluorocarbons (PFCs) gases, like C2F6 and CF4, into the atmosphere. These gases are super global warming/greenhouse gases because of their extremely long atmospheric lifetimes and excellent infrared absorption properties. We developed the first inductively coupled plasma (ICP) abatement device for destroying PFCs downstream of a plasma etcher. Destruction efficiencies of 99% and 94% can be obtained for the above mentioned PFCs, by using O 2 as an additive gas. Our results have lead to extensive modeling in academia as well as commercialization of the ICP abatement system. Dielectric patterning of hi-k materials for future device technology brings different environment challenges. The uncertainty of the hi-k material selection and the patterning method need to be addressed. We have evaluated the environmental impact of three different dielectric patterning methods (plasma etch, wet etch and chemical-mechanical polishing), as well as, the transistor device performances associated with the patterning methods. Plasma etching was found to be the most environmentally benign patterning method, which also gives the best device performance. However, the environmental concern for plasma etching is the possibility of cross-contamination from low volatility etch by-products. Therefore, mass transfer in a plasma etcher for a promising hi-k dielectric material, ZrO2, was studied. A novel cross-contamination sampling technique was developed, along with a mass transfer model.

BCA-kMC Hybrid Simulation for Hydrogen and Helium Implantation in Material under Plasma Irradiation

NASA Astrophysics Data System (ADS)

Kato, Shuichi; Ito, Atsushi; Sasao, Mamiko; Nakamura, Hiroaki; Wada, Motoi

2015-09-01

Ion implantation by plasma irradiation into materials achieves the very high concentration of impurity. The high concentration of impurity causes the deformation and the destruction of the material. This is the peculiar phenomena in the plasma-material interaction (PMI). The injection process of plasma particles are generally simulated by using the binary collision approximation (BCA) and the molecular dynamics (MD), while the diffusion of implanted atoms have been traditionally solved by the diffusion equation, in which the implanted atoms is replaced by the continuous concentration field. However, the diffusion equation has insufficient accuracy in the case of low concentration, and in the case of local high concentration such as the hydrogen blistering and the helium bubble. The above problem is overcome by kinetic Monte Carlo (kMC) which represents the diffusion of the implanted atoms as jumps on interstitial sites in a material. In this paper, we propose the new approach ``BCA-kMC hybrid simulation'' for the hydrogen and helium implantation under the plasma irradiation.

Dense Plasma Focus - From Alternative Fusion Source to Versatile High Energy Density Plasma Source for Plasma Nanotechnology

NASA Astrophysics Data System (ADS)

Rawat, R. S.

2015-03-01

The dense plasma focus (DPF), a coaxial plasma gun, utilizes pulsed high current electrical discharge to heat and compress the plasma to very high density and temperature with energy densities in the range of 1-10 × 1010 J/m3. The DPF device has always been in the company of several alternative magnetic fusion devices as it produces intense fusion neutrons. Several experiments conducted on many different DPF devices ranging over several order of storage energy have demonstrated that at higher storage energy the neutron production does not follow I4 scaling laws and deteriorate significantly raising concern about the device's capability and relevance for fusion energy. On the other hand, the high energy density pinch plasma in DPF device makes it a multiple radiation source of ions, electron, soft and hard x-rays, and neutrons, making it useful for several applications in many different fields such as lithography, radiography, imaging, activation analysis, radioisotopes production etc. Being a source of hot dense plasma, strong shockwave, intense energetic beams and radiation, etc, the DPF device, additionally, shows tremendous potential for applications in plasma nanoscience and plasma nanotechnology. In the present paper, the key features of plasma focus device are critically discussed to understand the novelties and opportunities that this device offers in processing and synthesis of nanophase materials using, both, the top-down and bottom-up approach. The results of recent key experimental investigations performed on (i) the processing and modification of bulk target substrates for phase change, surface reconstruction and nanostructurization, (ii) the nanostructurization of PLD grown magnetic thin films, and (iii) direct synthesis of nanostructured (nanowire, nanosheets and nanoflowers) materials using anode target material ablation, ablated plasma and background reactive gas based synthesis and purely gas phase synthesis of various different types of nanostructured materials using DPF device will discussed to establish this device as versatile tool for plasma nanotechnology.

Defect generation in electronic devices under plasma exposure: Plasma-induced damage

NASA Astrophysics Data System (ADS)

Eriguchi, Koji

2017-06-01

The increasing demand for higher performance of ULSI circuits requires aggressive shrinkage of device feature sizes in accordance with Moore’s law. Plasma processing plays an important role in achieving fine patterns with anisotropic features in metal-oxide-semiconductor field-effect transistors (MOSFETs). This article comprehensively addresses the negative aspect of plasma processing — plasma-induced damage (PID). PID naturally not only modifies the surface morphology of materials but also degrades the performance and reliability of MOSFETs as a result of defect generation in the materials. Three key mechanisms of PID, i.e., physical, electrical, and photon-irradiation interactions, are overviewed in terms of modeling, characterization techniques, and experimental evidence reported so far. In addition, some of the emerging topics — control of parameter variability in ULSI circuits caused by PID and recovery of PID — are discussed as future perspectives.

Nanostructured materials: A novel approach to enhanced performance. Final report

DOE Office of Scientific and Technical Information (OSTI.GOV)

Korth, G.E.; Froes, F.H.; Suryanarayana, C.

Nanostuctured materials are an emerging class of materials that can exhibit physical and mechanical characteristics often exceeding those exhibited by conventional course grained materials. A number of different techniques can be employed to produce these materials. In this program, the synthesis methods were (a) mechanical alloying , (b) physical vapor deposition, and (c) plasma processing. The physical vapor deposition and plasma processing were discontinued after initial testing with subsequent efforts focused on mechanical alloying. The major emphasis of the program was on the synthesis, consolidation, and characterization of nanostructured Al-Fe, Ti-Al, Ti-Al-Nb, and Fe-Al by alloying intermetallics with a viewmore » to increase their ductilities. The major findings of this project are reported.« less

Material for electrodes of low temperature plasma generators

DOEpatents

Caplan, Malcolm; Vinogradov, Sergel Evge'evich; Ribin, Valeri Vasil'evich; Shekalov, Valentin Ivanovich; Rutberg, Philip Grigor'evich; Safronov, Alexi Anatol'evich

2008-12-09

Material for electrodes of low temperature plasma generators. The material contains a porous metal matrix impregnated with a material emitting electrons. The material uses a mixture of copper and iron powders as a porous metal matrix and a Group IIIB metal component such as Y.sub.2O.sub.3 is used as a material emitting electrons at, for example, the proportion of the components, mass %: iron: 3-30; Y.sub.2O.sub.3:0.05-1; copper: the remainder. Copper provides a high level of heat conduction and electric conductance, iron decreases intensity of copper evaporation in the process of plasma creation providing increased strength and lifetime, Y.sub.2O.sub.3 provides decreasing of electronic work function and stability of arc burning. The material can be used for producing the electrodes of low temperature AC plasma generators used for destruction of liquid organic wastes, medical wastes, and municipal wastes as well as for decontamination of low level radioactive waste, the destruction of chemical weapons, warfare toxic agents, etc.

Material for electrodes of low temperature plasma generators

DOEpatents

Caplan, Malcolm; Vinogradov, Sergel Evge'evich; Ribin, Valeri Vasil'evich; Shekalov, Valentin Ivanovich; Rutberg, Philip Grigor'evich; Safronov, Alexi Anatol'evich; Shiryaev, Vasili Nikolaevich

2010-03-02

Material for electrodes of low temperature plasma generators. The material contains a porous metal matrix impregnated with a material emitting electrons. The material uses a mixture of copper and iron powders as a porous metal matrix and a Group IIIB metal component such as Y.sub.2O.sub.3 is used as a material emitting electrons at, for example, the proportion of the components, mass %: iron:3-30; Y.sub.2O.sub.3:0.05-1; copper: the remainder. Copper provides a high level of heat conduction and electric conductance, iron decreases intensity of copper evaporation in the process of plasma creation providing increased strength and lifetime, Y.sub.2O.sub.3 provides decreasing of electronic work function and stability of arc burning. The material can be used for producing the electrodes of low temperature AC plasma generators used for destruction of liquid organic wastes, medical wastes, municipal wastes as well as for decontamination of low level radioactive waste, the destruction of chemical weapons, warfare toxic agents, etc.

Effect of Coulomb Collisions on Low Gas Pressure Plasmas

DOE Office of Scientific and Technical Information (OSTI.GOV)

Nanbu, K.; Furubayashi, T.

2006-05-05

A recent trend in material processing plasmas is the use of a low gas pressure and high plasma density. In such plasmas, Coulomb collisions among charged particles has been considered to have a significant effect on plasma structure. By use of Bobylev and Nanbu's theory [Phy. Rev. E, 61(2000), 4576], this effect on argon plasmas and oxygen plasmas generated by a capacitive discharge is examined. It is found that the effect is appreciable only for oxygen plasmas.

Characterization and Surface Treatment of Materials Used in MADEAL S.A. Industry Productive Process of Rims by Plasma Assisted Repetitive Pulsed Arcs Technique

NASA Astrophysics Data System (ADS)

Jiménez, H.; Salazar, V. H.; Devia, A.; Jaramillo, S.; Velez, G.

2006-12-01

A study of materials used in the molds production to aluminium rims manufacture in the MADEAL S.A. factory was carried out for apply a plasma assisted surface treatment consists in growing TiAlN hard coatings that it protects this molds in the productive process. This coating resists high oxidation temperatures, of the other of 800 °C, high hardness (2800 Vickers) and low friction coefficient. A plasma assisted repetitive pulsed arcs mono-evaporator system was used in the grow of the TiAlN coatings, the TiAlN target is a sinterized 50% Ti and 50% Al, in the substrate they were used two types of steel that compose the molds injection pieces for the rims production. These materials were subjected to linear and fluctuating thermal changes in the Bruker axs X-Ray diffractometer temperature chamber, what simulated the molds thermal variation in the rims production process and they were compared with TiAlN coatings subjected to same thermal changes. The Materials characterization, before and later of thermal process, was carried out using XRD, SPM and EDS techniques, to analyze the crystallographic, topographic and chemical surface structure behaviours.

Rapid Fabrication of Lightweight SiC Optics using Reactive Atom Plasma (RAP) Processing

NASA Technical Reports Server (NTRS)

Fiske, Peter S.

2006-01-01

Reactive Atom Plasma (RAP) processing is a non-contact, plasma-based processing technology that can be used to generate damage-free optical surfaces. We have developed tools and processes using RAP that allow us to shape extremely lightweight mirror Surfaces made from extremely hard-to-machine materials (e.g. SiC). We will describe our latest results using RAP in combination with other technologies to produce finished lightweight SiC mirrors and also discuss applications for RAP in the rapid fabrication of mirror segments for reflective and grazing incidence telescopes.

Electron Heating Mode Transitions in Nitrogen (13.56 and 40.68) MHz RF-CCPs

NASA Astrophysics Data System (ADS)

Erozbek Gungor, Ummugul; Bilikmen, Sinan Kadri; Akbar, Demiral

2015-09-01

Capacitively coupled radio frequency plasmas (RF-CCPs) are commonly used in plasma material processing. Parametrical structure of the plasma determines the demands of processing applications. For example; high density plasmas in gamma mode are mostly preferred for etching applications while stabile plasmas in gamma mode are usually used in sputtering applications. For this reason, characterization of the plasma is very essential before surface modification of the materials. In this work, analysis of electron heating mode transition in high frequency (40.68 MHz) RF-CCP was deeply investigated. The plasma was generated in a home-made (500 × 400 mm2) stainless steel cylindrical reactor in which two identical (200 mm in diameter) electrodes were placed with 40 mm interval. In addition, L-type automatic matching network system was connected to the 40.68 MHz RF generator to get high accuracy. Moreover, the pure (99.995 %) nitrogen was used as an activation gas on account of having an appreciable impression in plasma processing applications. Furthermore, diagnostic measurements of the plasma were done by using the Impedans Langmuir single and double probe systems. It was found that two transition points; α- γ (pressure dependent) and γ- α (RF power dependent) were observed in both medium and high RF-CCPs. As a result, the α- γ pressure transition increased, whereas the γ- α power transition remained constant by changing the RF frequency sources.

Ring-Opening Polymerization of Cyclic Hemiacetal Esters for the Preparation of Hydrolytically and Thermally Degradable Polymers

NASA Astrophysics Data System (ADS)

Neitzel, Angelika Susanne Elisabeth

During the course of tokamak operation, material is routinely eroded from plasma facing components and transported to other regions of the machine. This net-reshaping process will lead to many challenges in a high duty cycle magnetic fusion reactor, and is also highly relevant to the wall conditioning process in current experiments. Proper modeling of this mechanism requires a global treatment of the entire tokamak, and integration of tightly coupled plasma and surface processes. This thesis focuses on extending and applying the WallDYN mixed-material migration code [1] [2], which couples local erosion and deposition processes with plasma impurity transport in a non-iterative, self-consistent manner that maintains overall material balance. NSTX-U operated in 2016 with carbon PFCs, periodically conditioned with boron-containing films to suppress oxygen impurities. However, oxygen levels tended to return to a pre-conditioned state following repeated plasma exposure, and this occurred on a faster time scale when conditioning with less boron. This C/B/O migration is interpretively modeled with WallDYN, which successfully reproduces observed trends in oxygen evolution. A new model for spatially inhomogenous mixed material films has been developed for WallDYN, which allows for the differentiation between conditioning films of varying thicknesses. A boron coverage model for the NSTX-U glow discharge boronization process is also developed. These new capabilities improve WallDYN agreement with observed NSTX-U spectroscopic data by at least a factor of 2. As part of the integrated model, plasma backgrounds representing NSTX-U H-modes and L-modes are calculated using OSM-EIRENE, constrained by a combination of NSTX-U data and NSTX SOLPS calculations. The effect of modifying the assumed parallel SOL profile is examined, with the result that inner divertor-directed flows turn the outer divertor from a region of net boron deposition to one of net boron erosion. Plasma impurity transport calculations are carried out with DIVIMP, and mixed-material sputtering calculations are carried out for a range of possible surfaces with SDTRIMSP. WallDYN modeling of C/Li/O migration in NSTX is presented, utilizing OSM-EIRENE calculations of lithiated NSTX plasmas. An adatom model of temperature-enhanced sputtering has been added to WallDYN, and the effect of various surface temperature scenarios is examined. A sensitivity study of surface binding energies used in WallDYN sputtering calculations is carried out, finding that mixed material effects become dominant when the system contains both tightly- and weakly- bound elements (such as C and Li).

Emission coefficients of low temperature thermal iron plasma

NASA Astrophysics Data System (ADS)

Mościcki, T.; Hoffman, J.; Szymański, Z.

2004-03-01

Iron plasma appears during material processing with laser, electric are etc., and has considerable influence on the processing conditions. In this paper emission coefficients of low temperature thermal iron plasma at atmospheric pressure are presented. Net emission coefficients ɛ N have been calculated for pure iron plasma as well as for Fe-Ar and Fe-He plasma mixtures. To calculate the recombination radiation the knowledge of the Biberman factors ξ {fb/z}( T e, λ) is necessary and they have been calculated from the iron photo-ionization cross sections. The calculations allow estimation of energy losses, energy radiated by plasma plume and its comparison with the energy absorbed from laser beam.

Core/shell silicon/polyaniline particles via in-flight plasma-induced polymerization

NASA Astrophysics Data System (ADS)

Yasar-Inceoglu, Ozgul; Zhong, Lanlan; Mangolini, Lorenzo

2015-08-01

Although silicon nanoparticles have potential applications in many relevant fields, there is often the need for post-processing steps to tune the property of the nanomaterial and to optimize it for targeted applications. In particular surface modification is generally necessary to both tune dispersibility of the particles in desired solvents to achieve optimal coating conditions, and to interface the particles with other materials to realize functional heterostructures. In this contribution we discuss the realization of core/shell silicon/polymer nanoparticles realized using a plasma-initiated in-flight polymerization process. Silicon particles are produced in a non-thermal plasma reactor using silane as a precursor. After synthesis they are aerodynamically injected into a second plasma reactor into which aniline vapor is introduced. The second plasma initiates the polymerization reactor leading to the formation of a 3-4 nm thick polymer shell surrounding the silicon core. The role of processing conditions on the properties of the polymeric shell is discussed. Preliminary results on the testing of this material as an anode for lithium ion batteries are presented.

Reactive species in non-equilibrium atmospheric-pressure plasmas: Generation, transport, and biological effects

NASA Astrophysics Data System (ADS)

Lu, X.; Naidis, G. V.; Laroussi, M.; Reuter, S.; Graves, D. B.; Ostrikov, K.

2016-05-01

Non-equilibrium atmospheric-pressure plasmas have recently become a topical area of research owing to their diverse applications in health care and medicine, environmental remediation and pollution control, materials processing, electrochemistry, nanotechnology and other fields. This review focuses on the reactive electrons and ionic, atomic, molecular, and radical species that are produced in these plasmas and then transported from the point of generation to the point of interaction with the material, medium, living cells or tissues being processed. The most important mechanisms of generation and transport of the key species in the plasmas of atmospheric-pressure plasma jets and other non-equilibrium atmospheric-pressure plasmas are introduced and examined from the viewpoint of their applications in plasma hygiene and medicine and other relevant fields. Sophisticated high-precision, time-resolved plasma diagnostics approaches and techniques are presented and their applications to monitor the reactive species and plasma dynamics in the plasma jets and other discharges, both in the gas phase and during the plasma interaction with liquid media, are critically reviewed. The large amount of experimental data is supported by the theoretical models of reactive species generation and transport in the plasmas, surrounding gaseous environments, and plasma interaction with liquid media. These models are presented and their limitations are discussed. Special attention is paid to biological effects of the plasma-generated reactive oxygen and nitrogen (and some other) species in basic biological processes such as cell metabolism, proliferation, survival, etc. as well as plasma applications in bacterial inactivation, wound healing, cancer treatment and some others. Challenges and opportunities for theoretical and experimental research are discussed and the authors' vision for the emerging convergence trends across several disciplines and application domains is presented to stimulate critical discussions and collaborations in the future.

Contribution to the beam plasma material interactions during material processing with TEA CO2 laser radiation

NASA Astrophysics Data System (ADS)

Jaschek, Rainer; Konrad, Peter E.; Mayerhofer, Roland; Bergmann, Hans W.; Bickel, Peter G.; Kowalewicz, Roland; Kuttenberger, Alfred; Christiansen, Jens

1995-03-01

The TEA-CO2-laser (transversely excited atmospheric pressure) is a tool for the pulsed processing of materials with peak power densities up to 1010 W/cm2 and a FWHM of 70 ns. The interaction between the laser beam, the surface of the work piece and the surrounding atmosphere as well as gas pressure and the formation of an induced plasma influences the response of the target. It was found that depending on the power density and the atmosphere the response can take two forms. (1) No target modification due to optical break through of the atmosphere and therefore shielding of the target (air pressure above 10 mbar, depending on the material). (2) Processing of materials (air pressure below 10 mbar, depending on the material) with melting of metallic surfaces (power density above 0.5 109 W/cm2), hole formation (power density of 5 109 W/cm2) and shock hardening (power density of 3.5 1010 W/cm2). All those phenomena are usually linked with the occurrence of laser supported combustion waves and laser supported detonation waves, respectively for which the mechanism is still not completely understood. The present paper shows how short time photography and spatial and temporal resolved spectroscopy can be used to better understand the various processes that occur during laser beam interaction. The spectra of titanium and aluminum are observed and correlated with the modification of the target. If the power density is high enough and the gas pressure above a material and gas composition specific threshold, the plasma radiation shows only spectral lines of the background atmosphere. If the gas pressure is below this threshold, a modification of the target surface (melting, evaporation and solid state transformation) with TEA-CO2- laser pulses is possible and the material specific spectra is observed. In some cases spatial and temporal resolved spectroscopy of a plasma allows the calculation of electron temperatures by comparison of two spectral lines.

Optimization of Dimensional accuracy in plasma arc cutting process employing parametric modelling approach

NASA Astrophysics Data System (ADS)

Naik, Deepak kumar; Maity, K. P.

2018-03-01

Plasma arc cutting (PAC) is a high temperature thermal cutting process employed for the cutting of extensively high strength material which are difficult to cut through any other manufacturing process. This process involves high energized plasma arc to cut any conducting material with better dimensional accuracy in lesser time. This research work presents the effect of process parameter on to the dimensional accuracy of PAC process. The input process parameters were selected as arc voltage, standoff distance and cutting speed. A rectangular plate of 304L stainless steel of 10 mm thickness was taken for the experiment as a workpiece. Stainless steel is very extensively used material in manufacturing industries. Linear dimension were measured following Taguchi’s L16 orthogonal array design approach. Three levels were selected to conduct the experiment for each of the process parameter. In all experiments, clockwise cut direction was followed. The result obtained thorough measurement is further analyzed. Analysis of variance (ANOVA) and Analysis of means (ANOM) were performed to evaluate the effect of each process parameter. ANOVA analysis reveals the effect of input process parameter upon leaner dimension in X axis. The results of the work shows that the optimal setting of process parameter values for the leaner dimension on the X axis. The result of the investigations clearly show that the specific range of input process parameter achieved the improved machinability.

New Mixed Conductivity Mechanisms in the Cold Plasma Device Based on Silver-Modified Zeolite Microporous Electronic Materials

NASA Astrophysics Data System (ADS)

Koç, Sevgul Ozturk; Galioglu, Sezin; Ozturk, Seckin; Kurç, Burcu Akata; Koç, Emrah; Salamov, Bahtiyar G.

2018-02-01

We have analyzed the interaction between microdischarge and microporous zeolite electronic materials modified by silver (Ag0) nanoparticles (resistivity 1011 to 106 Ω cm) on the atmospheric pressure cold plasma generation in air. The generation and maintenance of stable cold plasma is studied according to the effect of the Ag0 nanoparticles. The role of charge carriers in mixed conductivity processes and electrical features of zeolite from low pressure to atmospheric pressure is analyzed in air microplasmas for both before and after breakdown regimes. The results obtained from the experiments indicate that Ag0 nanoparticles play a significant role in considerably reducing the breakdown voltage in plasma electronic devices with microporous zeolite electronic materials.

Functionalization of polymer powders for SLS-processes using an atmospheric plasma jet in a fluidized bed reactor

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sachs, Marius; Schmitt, Adeliene; Schmidt, Jochen

2015-05-22

Recently additive manufacturing processes such as selective laser sintering (SLS) of polymers have gained more importance for industrial applications [1]. Tailor-made modification of polymers is essential in order to make these processes more efficient and to cover the industrial demands. The so far used polymer materials show weak performance regarding the mechanical stability of processed parts. To overcome this limitation, a new route to functionalize the surface of commercially available polymer particles (PA12; PE-HD; PP) using an atmospheric plasma jet in combination with a fluidized bed reactor has been investigated. Consequently, an improvement of adhesion and wettability [2] of themore » polymer surface without restraining the bulk properties of the powder is achieved. The atmospheric plasma jet process can provide reactive species at moderate temperatures which are suitable for polymer material. The functionalization of the polymer powders improves the quality of the devices build in a SLS-process.« less

Isomer and Fluorination Effects among Fluorine Substituted Hydrocarbon C3/C4 Molecules in Electron Impact Ionization

NASA Astrophysics Data System (ADS)

Patel, U. R.; Joshipura, K. N.

2015-05-01

Electron collision processes are very important in both man-made and natural plasmas, for determining the energy balances and transport properties of electrons. Electron -molecule scattering leading to ionization represents one of the most fundamental processes in collision physics. In the gas phase, the total efficiency of the process is described by the absolute total electron impact ionization cross section. Carbon based materials are some of the widely used materials for a divertor plate and magnetically confined fusion devices. In the ``ITER,'' it is very important for steady state operation to have an estimate of the lifetime of carbon plasma facing components. Apart from fusion plasma relevance, the present theoretical study is very important in modeling and controlling other electron assisted processes in many areas. Hydrocarbons play an important role for plasma diagnostics as impurities in the Tokamak fusion divertor, as seed gases for the production of radicals and ions in low temperature plasma processing. Fluorine substituted hydrocarbons (perfluorocarbons) are important as reactants in plasma assisted fabrication processes. In the present work, we have calculated total ionization cross sections Qion for C3/C4 Hydrocarbon isomers by electron impact, and comparisons are made mutually to observe isomer effect. Comparisons are also made by substituting H atom by F atom and revealing fluorination effect. The present calculations are quite significant owing to the lack of experimental data, with just an isolated previous theoretical work in some cases.

Atmospheric-Pressure Plasma Interaction with Soft Materials as Fundamental Processes in Plasma Medicine.

PubMed

Takenaka, Kosuke; Miyazaki, Atsushi; Uchida, Giichiro; Setsuhara, Yuichi

2015-03-01

Molecular-structure variation of organic materials irradiated with atmospheric pressure He plasma jet have been investigated. Optical emission spectrum in the atmospheric-pressure He plasma jet has been measured. The spectrum shows considerable emissions of He lines, and the emission of O and N radicals attributed to air. Variation in molecular structure of Polyethylene terephthalate (PET) film surface irradiated with the atmospheric-pressure He plasma jet has been observed via X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spectroscopy (FT-IR). These results via XPS and FT-IR indicate that the PET surface irradiated with the atmospheric-pressure He plasma jet was oxidized by chemical and/or physical effect due to irradiation of active species.

Plasma-edge studies using carbon resistance probes

DOE Office of Scientific and Technical Information (OSTI.GOV)

Wampler, W.R.

1984-01-01

Characterization of erosion and hydrogen-recycling processes occurring at the edge of magnetically confined plasmas requires knowledge of the energy and flux of hydrogen isotopes incident on the materials. A new plasma-edge probe technique, the carbon resistance probe, has been developed to obtain this information. This technique uti

Method and system for nanoscale plasma processing of objects

DOEpatents

Oehrlein, Gottlieb S [Clarksville, MD; Hua, Xuefeng [Hyattsville, MD; Stolz, Christian [Baden-Wuerttemberg, DE

2008-12-30

A plasma processing system includes a source of plasma, a substrate and a shutter positioned in close proximity to the substrate. The substrate/shutter relative disposition is changed for precise control of substrate/plasma interaction. This way, the substrate interacts only with a fully established, stable plasma for short times required for nanoscale processing of materials. The shutter includes an opening of a predetermined width, and preferably is patterned to form an array of slits with dimensions that are smaller than the Debye screening length. This enables control of the substrate/plasma interaction time while avoiding the ion bombardment of the substrate in an undesirable fashion. The relative disposition between the shutter and the substrate can be made either by moving the shutter or by moving the substrate.

Processing of insulators and semiconductors

DOEpatents

Quick, Nathaniel R.; Joshi, Pooran C.; Duty, Chad Edward; Jellison, Jr., Gerald Earle; Angelini, Joseph Attilio

2015-06-16

A method is disclosed for processing an insulator material or a semiconductor material. The method includes pulsing a plasma lamp onto the material to diffuse a doping substance into the material, to activate the doping substance in the material or to metallize a large area region of the material. The method may further include pulsing a laser onto a selected region of the material to diffuse a doping substance into the material, to activate the doping substance in the material or to metallize a selected region of the material.

Plasma Jet Interactions with Liquids in Partial Fulfillment of an NRL Karles Fellowship

DTIC Science & Technology

2015-11-30

deposition), modify (e.g., chemical functionalization), and etch (in Si technology) materials. In low- pressure non- equilibrium discharge plasmas... equilibrium discharge plasmas, associated with the above processes, the electron population is much more energetic than both the ions and neutral gas...to be crucial to the advancements of these fields1, 2. Background: Atmospheric-pressure, non- equilibrium (APNE) plasmas, like low-pressure plasmas

Experimental investigation of the contact resistance of Graphene/MoS2 interface treated with O2 plasma

NASA Astrophysics Data System (ADS)

Lu, Qin; Liu, Yan; Han, Genquan; Fang, Cizhe; Shao, Yao; Zhang, Jincheng; Hao, Yue

2018-02-01

High contact resistance has been a major bottleneck for MoS2 to achieve high performances among two-dimensional material based optoelectronic and electronic devices. In this study, we investigate the contact resistances of different layered graphene film with MoS2 film with Ti/Au electrodes under different O2 plasma treatment time using the circular transmission line model (CTLM). Annealing process followed O2 plasma process to reduce the oxygen element introduced. Raman and X-ray photoelectric spectroscopy were used to analyze the quality of the materials. Finally, the current and voltage curve indicates good linear characteristics. Under the optimized condition of the O2 plasma treatment, a relatively low contact resistance (∼35.7 Ohm mm) without back gate voltage in single-layer graphene/MoS2 structure at room temperature was achieved compared with the existing reports. This method of introducing graphene as electrodes for MoS2 film demonstrates a remarkable ability to improve the contact resistance, without additional channel doping for two-dimensional materials based devices, which paves the way for MoS2 to be a more promising channel material in optoelectronic and electronic integration.

Application of low temperature plasmas for restoration/conservation of archaeological objects

NASA Astrophysics Data System (ADS)

Krčma, F.; Blahová, L.; Fojtíková, P.; Graham, W. G.; Grossmannová, H.; Hlochová, L.; Horák, J.; Janová, D.; Kelsey, C. P.; Kozáková, Z.; Mazánková, V.; Procházka, M.; Přikryl, R.; Řádková, L.; Sázavská, V.; Vašíček, M.; Veverková, R.; Zmrzlý, M.

2014-12-01

The low-temperature low-pressure hydrogen based plasmas were used to study the influence of processes and discharge conditions on corrosion removal. The capacitive coupled RF discharge in the continuous or pulsed regime was used at operating pressure of 100-200 Pa. Plasma treatment was monitored by optical emission spectroscopy. To be able to study influence of various process parameters, the model corroded samples with and without sandy incrustation were prepared. The SEM-EDX analyzes were carried out to verify corrosion removal efficiency. Experimental conditions were optimized for the selected most frequent materials of original metallic archaeological objects (iron, bronze, copper, and brass). Chlorides removal is based on hydrogen ion reactions while oxides are removed mainly by neutral species interactions. A special focus was kept for the samples temperature because it was necessary to avoid any metallographic changes in the material structure. The application of higher power pulsed regime with low duty cycle seems be the best treatment regime. The low pressure hydrogen plasma is not applicable for objects with a very broken structure or for nonmetallic objects due to the non-uniform heat stress. Due to this fact, the new developed plasmas generated in liquids were applied on selected original archaeological glass materials.

Multi-Layer Coating of Ultrathin Polymer Films on Nanoparticles of Alumina by a Plasma Treatment

DTIC Science & Technology

2001-01-01

Proc. Vol. 635 © 2001 Materials Research Society Multi-Layer Coating of Ultrathin Polymer Films on Nanoparticles of Alumina by a Plasma Treatment Donglu...interconnected organic and inorganic networks results in coatings with a very low permeability for gases and liquids. Hybrid materials are very suitable for... materials consist of a clear alcoholic solution that can easily be processed by classical application techniques such as dipping, spraying, or spin coating

A simulation approach to material removal in microwave drilling of soda lime glass at 2.45 GHz

NASA Astrophysics Data System (ADS)

Lautre, Nitin Kumar; Sharma, Apurbba Kumar; Pradeep, Kumar; Das, Shantanu

2015-09-01

Material removal during microwave drilling is basically due to thermal ablation of the material in the vicinity of the drilling tool. The microtip of the tool, also termed as concentrator, absorbs microwaves and ionizes the dielectric in its proximity creating a zone of plasma. The plasma takes the shape of a sphere owing to the atmospheric sphere, which acts as the source of thermal energy to be used for processing a material. This mechanism of heating, also called localized microwave heating, was used in the present study to drill holes in 1.2-mm-thick soda lime glass. The mechanism of material removal had been analyzed through simulation of the hot spot region, and the results were attempted to explain through experiment observations. It was realized that the glass being a poor conductor of heat, a low power (90 W in this case) yields better drilling results owing to more localized heat corresponding to a low-volume plasma sphere. The low application time prevents further heat transfer, and a localized concentration of heat becomes possible that primarily causes the material ablation. The plasma sphere appears sustain while the tool moves through the bulk of the glass thickness although its volume gets further shrunk. The process needs careful selection of the parameters. The simulation results show relatively low temperature in the top half (opposite to the tool tip) of the plasma sphere which eventually causes the semimolten viscous glass to collapse into the drill cavity as the tool advances into the bulk and stops the movement of the tool. The continued plasma sphere raises the tip temperature, which makes the tip to melt and gets blunt. The plasma formation ceases owing to larger diameter of the tool, and the tool gets stuck which could be verified through experimental results.

The role of energetic ions from plasma in the creation of nanostructured materials and stable polymer surface treatments

NASA Astrophysics Data System (ADS)

Bilek, M. M. M.; Newton-McGee, K.; McKenzie, D. R.; McCulloch, D. G.

2006-01-01

Plasma processes for the synthesis of new materials as thin films have enabled the production of a wide variety of new materials. These include meta-stable phases, which are not readily found in nature, and more recently, materials with structure on the nanoscale. Study of plasma synthesis processes at the fundamental level has revealed that ion energy, depositing flux and growth surface temperature are the critical parameters affecting the microstructure and the properties of the thin film materials formed. In this paper, we focus on the role of ion flux and impact energy in the creation of thin films with nanoscale structure in the form of multilayers. We describe three synthesis strategies, based on the extraction of ions from plasma sources and involving modulation of ion flux and ion energy. The microstructure, intrinsic stress and physical properties of the multilayered samples synthesized are studied and related back to the conditions at the growth surface during deposition. When energetic ions of a non-condensing species are used, it is possible to place active groups on the surfaces of materials such as polymers. These active groups can then be used as bonding sites in subsequent chemical attachment of proteins or other macromolecules. If the energy of the non-condensing ions is increased to a few keV then modified layers buried under the surface can be produced. Here we describe a method by which the aging effect, which is often observed in plasma surface modifications on polymers, can be reduced and even eliminated using high energy ion bombardment.

Development of barrier coatings for cellulosic-based materials by cold plasma methods

NASA Astrophysics Data System (ADS)

Denes, Agnes Reka

Cellulose-based materials are ideal candidates for future industries that need to be based on environmentally safe technologies and renewable resources. Wood represents an important raw material and its application as construction material is well established. Cellophane is one of the most important cellulosic material and it is widely used as packaging material in the food industry. Outdoor exposure of wood causes a combination of physical and chemical degradation processes due to the combined effects of sunlight, moisture, fungi, and bacteria. Cold-plasma-induced surface modifications are an attractive way for tailoring the characteristics of lignocellulosic substrates to prevent weathering degradation. Plasma-polymerized hexamethyldisiloxane (PPHMDSO) was deposited onto wood surfaces to create water repellent characteristics. The presence of a crosslinked macromolecular structure was detected. The plasma coated samples exhibited very high water contact angle values indicating the existence of hydrophobic surfaces. Reflective and electromagnetic radiation-absorbent substances were incorporated with a high-molecular-weight polydimethylsiloxane polymer in liquid phase and deposited as thin layers on wood surfaces. The macromolecular films, containing the dispersed materials, were then converted into a three dimensional solid state network by exposure to a oxygen-plasma. It was demonstrated that both UV-absorbent and reflectant components incorporated into the plasma-generated PDMSO matrix protected the wood from weathering degradation. Reduced oxidation and less degradation was observed after simulated weathering. High water contact angle values indicated a strong hydrophobic character of the oxygen plasma-treated PDMSO-coated samples. Plasma-enhanced surface modifications and coatings were employed to create water-vapor barrier layers on cellophane substrate surfaces. HMDSO was selected as a plasma gas and oxygen was used to ablate amorphous regions. Oxygen plasma treated cellophane and oxygen plasma treated and PPHMDSO coated cellophane surfaces were comparatively analyzed and the corresponding surface wettability characteristics were evaluated. The plasma generated surface topographies controlled the morphology of the PPHMDSO layers. Higher temperature HMDSO plasma-state environments lead to insoluble, crosslinked layers. Continuous and pulsed Csb2Fsb6 plasmas were also used for surface modification and excellent surface fluorination was achieved under the pulsed plasma conditions.

Photo-oxidation of Polymers Synthesized by Plasma and Initiated CVD

DOE PAGES

Baxamusa, Salmaan H.; Suresh, Aravind; Ehrmann, Paul; ...

2015-11-09

Plasma polymers are often limited by their susceptibility to spontaneous and photo-oxidation. We show that the unusual photoluminescence (PL) behavior of a plasma polymer of trans-2-butene is correlated with its photoluminescence strength. These photo-processes occur under blue light illumination (λ=405 nm), distinguishing them from traditional ultraviolet degradation of polymers. These photo-active defects are likely formed during the plasma deposition process and we show that a polymer synthesized using initiated (i)CVD, non-plasma method, has 1000× lower PL signal and enhanced photo-stability. In conclusion, non-plasma methods such as iCVD may therefore be a route to overcoming material aging issues that limit themore » adoption of plasma polymers.« less

Plasma processes for producing silanes and derivatives thereof

DOEpatents

Laine, Richard M; Massey, Dean Richard; Peterson, Peter Young

2014-03-25

The invention is generally related to process for generating one or more molecules having the formula Si.sub.xH.sub.y, Si.sub.xD.sub.y, Si.sub.xH.sub.yD.sub.z, and mixtures thereof, where x,y and z are integers .gtoreq.1, H is hydrogen and D is deuterium, such as silane, comprising the steps of: providing a silicon containing material, wherein the silicon containing material includes at least 20 weight percent silicon atoms based on the total weight of the silicon containing material; generating a plasma capable of vaporizing a silicon atom, sputtering a silicon atom, or both using a plasma generating device; and contacting the plasma to the silicon containing material in a chamber having an atmosphere that includes at least about 0.5 mole percent hydrogen atoms and/or deuterium atoms based on the total moles of atoms in the atmosphere; so that a molecule having the formula Si.sub.xH.sub.y; (e.g., silane) is generated. The process preferably includes a step of removing one or more impurities from the Si.sub.xH.sub.y (e.g., the silane) to form a clean Si.sub.xH.sub.y, Si.sub.xD.sub.y, Si.sub.xH.sub.yD.sub.z (e.g., silane). The process may also include a step of reacting the Si.sub.xH.sub.y, Si.sub.xD.sub.y, Si.sub.xH.sub.yD.sub.z (e.g., the silane) to produce a high purity silicon containing material such as electronic grade metallic silicon, photovoltaic grade metallic silicon, or both.

Ion-plasma protective coatings for gas-turbine engine blades

NASA Astrophysics Data System (ADS)

Kablov, E. N.; Muboyadzhyan, S. A.; Budinovskii, S. A.; Lutsenko, A. N.

2007-10-01

Evaporated, diffusion, and evaporation—diffusion protective and hardening multicomponent ionplasma coatings for turbine and compressor blades and other gas-turbine engine parts are considered. The processes of ion surface treatment (ion etching and ion saturation of a surface in the metallic plasma of a vacuum arc) and commercial equipment for the deposition of coatings and ion surface treatment are analyzed. The specific features of the ion-plasma coatings deposited from the metallic plasma of a vacuum arc are described, and the effect of the ion energy on the phase composition of the coatings and the processes occurring in the surface layer of an article to be treated are discussed. Some properties of ion-plasma coatings designed for various purposes are presented. The ion surface saturation of articles made from structural materials is shown to change the structural and phase states of their surfaces and, correspondingly, the related properties of these materials (i.e., their heat resistance, corrosion resistance, fatigue strength, and so on).

Plasmas for environmental issues: from hydrogen production to 2D materials assembly

NASA Astrophysics Data System (ADS)

Tatarova, E.; Bundaleska, N.; Sarrette, J. Ph; Ferreira, C. M.

2014-12-01

It is well recognized at present that the unique, high energy density plasma environment provides suitable conditions to dissociate/atomize molecules in remediation systems, to convert waste and biomass into sustainable energy sources, to purify water, to assemble nanostructures, etc. The remarkable plasma potential is based on its ability to supply simultaneously high fluxes of charged particles, chemically active molecules, radicals (e.g. O, H, OH), heat, highly energetic photons (UV and extreme UV radiation), and strong electric fields in intrinsic sheath domains. Due to this complexity, low-temperature plasma science and engineering is a huge, highly interdisciplinary field that spans many research disciplines and applications across many areas of our daily life and industrial activities. For this reason, this review deals only with some selected aspects of low-temperature plasma applications for a clean and sustainable environment. It is not intended to be a comprehensive survey, but just to highlight some important works and achievements in specific areas. The selected issues demonstrate the diversity of plasma-based applications associated with clean and sustainable ambiance and also show the unity of the underlying science. Fundamental plasma phenomena/processes/features are the common fibers that pass across all these areas and unify all these applications. Browsing through different topics, we try to emphasize these phenomena/processes/features and their uniqueness in an attempt to build a general overview. The presented survey of recently published works demonstrates that plasma processes show a significant potential as a solution for waste/biomass-to-energy recovery problems. The reforming technologies based on non-thermal plasma treatment of hydrocarbons show promising prospects for the production of hydrogen as a future clean energy carrier. It is also shown that plasmas can provide numerous agents that influence biological activity. The simultaneous generation in water discharges of intense UV radiation, shock waves and active radicals (OH, O, H2O2, etc), which are all effective agents against many biological pathogens and harmful chemicals, make these discharges suitable for decontamination, sterilization and purification processes. Moreover, plasmas appear as invaluable tools for the synthesis and engineering of new nanomaterials and in particular 2D materials. A brief overview on plasma-synthesized carbon nanostructures shows the high potential of such materials for energy conversion and storage applications.

Influence of radiative processes on the ignition of deuterium–tritium plasma containing inactive impurities

DOE Office of Scientific and Technical Information (OSTI.GOV)

Gus’kov, S. Yu., E-mail: guskov@sci.lebedev.ru; Sherman, V. E.

2016-08-15

The degree of influence of radiative processes on the ignition of deuterium–tritium (DT) plasma has been theoretically studied as dependent on the content of inactive impurities in plasma. The analytic criterion of plasma ignition in inertial confinement fusion (ICF) targets is modified taking into account the absorption of intrinsic radiation from plasma in the ignition region. The influence of radiative processes on the DT plasma ignition has been analytically and numerically studied for plasma that contains a significant fraction of inactive impurities either as a result of DT fuel mixing with ICF target ablator material or as a result ofmore » using light metal DT-hydrides as solid noncryogenic fuel. It has been shown that the effect of the absorption of intrinsic radiation leads to lower impurity-induced increase in the ignition energy as compared to that calculated in the approximation of optically transparent ignition region.« less

Thermal plasma process for recovering monomers and high value carbons from polymeric materials

DOEpatents

Knight, Richard; Grossmann, Elihu D.; Guddeti, Ravikishan R.

2002-01-01

The present invention relates to a method of recycling polymeric waste products into monomers and high value forms of carbon by pyrolytic conversion using an induction coupled RF plasma heated reactor.

Direct fabrication of 3D graphene on nanoporous anodic alumina by plasma-enhanced chemical vapor deposition

PubMed Central

Zhan, Hualin; Garrett, David J.; Apollo, Nicholas V.; Ganesan, Kumaravelu; Lau, Desmond; Prawer, Steven; Cervenka, Jiri

2016-01-01

High surface area electrode materials are of interest for a wide range of potential applications such as super-capacitors and electrochemical cells. This paper describes a fabrication method of three-dimensional (3D) graphene conformally coated on nanoporous insulating substrate with uniform nanopore size. 3D graphene films were formed by controlled graphitization of diamond-like amorphous carbon precursor films, deposited by plasma-enhanced chemical vapour deposition (PECVD). Plasma-assisted graphitization was found to produce better quality graphene than a simple thermal graphitization process. The resulting 3D graphene/amorphous carbon/alumina structure has a very high surface area, good electrical conductivity and exhibits excellent chemically stability, providing a good material platform for electrochemical applications. Consequently very large electrochemical capacitance values, as high as 2.1 mF for a sample of 10 mm3, were achieved. The electrochemical capacitance of the material exhibits a dependence on bias voltage, a phenomenon observed by other groups when studying graphene quantum capacitance. The plasma-assisted graphitization, which dominates the graphitization process, is analyzed and discussed in detail. PMID:26805546

Direct fabrication of 3D graphene on nanoporous anodic alumina by plasma-enhanced chemical vapor deposition.

PubMed

Zhan, Hualin; Garrett, David J; Apollo, Nicholas V; Ganesan, Kumaravelu; Lau, Desmond; Prawer, Steven; Cervenka, Jiri

2016-01-25

High surface area electrode materials are of interest for a wide range of potential applications such as super-capacitors and electrochemical cells. This paper describes a fabrication method of three-dimensional (3D) graphene conformally coated on nanoporous insulating substrate with uniform nanopore size. 3D graphene films were formed by controlled graphitization of diamond-like amorphous carbon precursor films, deposited by plasma-enhanced chemical vapour deposition (PECVD). Plasma-assisted graphitization was found to produce better quality graphene than a simple thermal graphitization process. The resulting 3D graphene/amorphous carbon/alumina structure has a very high surface area, good electrical conductivity and exhibits excellent chemically stability, providing a good material platform for electrochemical applications. Consequently very large electrochemical capacitance values, as high as 2.1 mF for a sample of 10 mm(3), were achieved. The electrochemical capacitance of the material exhibits a dependence on bias voltage, a phenomenon observed by other groups when studying graphene quantum capacitance. The plasma-assisted graphitization, which dominates the graphitization process, is analyzed and discussed in detail.

Materials for Advanced Turbine Engines (MATE). Project 4: Erosion resistant compressor airfoil coating

NASA Technical Reports Server (NTRS)

Rashid, J. M.; Freling, M.; Friedrich, L. A.

1987-01-01

The ability of coatings to provide at least a 2X improvement in particulate erosion resistance for steel, nickel and titanium compressor airfoils was identified and demonstrated. Coating materials evaluated included plasma sprayed cobalt tungsten carbide, nickel carbide and diffusion applied chromium plus boron. Several processing parameters for plasma spray processing and diffusion coating were evaluated to identify coating systems having the most potential for providing airfoil erosion resistance. Based on laboratory results and analytical evaluations, selected coating systems were applied to gas turbine blades and evaluated for surface finish, burner rig erosion resistance and effect on high cycle fatigue strength. Based on these tests, the following coatings were recommended for engine testing: Gator-Gard plasma spray 88WC-12Co on titanium alloy airfoils, plasma spray 83WC-17Co on steel and nickel alloy airfoils, and Cr+B on nickel alloy airfoils.

Aluminium content of some processed foods, raw materials and food additives in China by inductively coupled plasma-mass spectrometry.

PubMed

Deng, Gui-Fang; Li, Ke; Ma, Jing; Liu, Fen; Dai, Jing-Jing; Li, Hua-Bin

2011-01-01

The level of aluminium in 178 processed food samples from Shenzhen city in China was evaluated using inductively coupled plasma-mass spectrometry. Some processed foods contained a concentration of up to 1226 mg/kg, which is about 12 times the Chinese food standard. To establish the main source in these foods, Al levels in the raw materials were determined. However, aluminium concentrations in raw materials were low (0.10-451.5 mg/kg). Therefore, aluminium levels in food additives used in these foods was determined and it was found that some food additives contained a high concentration of aluminium (0.005-57.4 g/kg). The results suggested that, in the interest of public health, food additives containing high concentrations of aluminium should be replaced by those containing less. This study has provided new information on aluminium levels in Chinese processed foods, raw materials and a selection of food additives.

Using the Tritium Plasma Experiment to evaluate ITER PFC safety

NASA Astrophysics Data System (ADS)

Longhurst, Glen R.; Anderl, Robert A.; Bartlit, John R.; Causey, Rion A.; Haines, John R.

The Tritium Plasma Experiment was assembled at Sandia National Laboratories, Livermore to investigate interactions between dense plasmas at low energies and plasma-facing component materials. This apparatus has the unique capability of replicating plasma conditions in a tokamak divertor with particle flux densities of 2 x 10(exp 19) ions/((sq cm)(s)) and a plasma temperature of about 15 eV using a plasma that includes tritium. With the closure of the Tritium Research Laboratory at Livermore, the experiment was moved to the Tritium Systems Test Assembly facility at Los Alamos National Laboratory. An experimental program has been initiated there using the Tritium Plasma Experiment to examine safety issues related to tritium in plasma-facing components, particularly the ITER divertor. Those issues include tritium retention and release characteristics, tritium permeation rates and transient times to coolant streams, surface modification and erosion by the plasma, the effects of thermal loads and cycling, and particulate production. A considerable lack of data exists in these areas for many of the materials, especially beryllium, being considered for use in ITER. Not only will basic material behavior with respect to safety issues in the divertor environment be examined, but innovative techniques for optimizing performance with respect to tritium safety by material modification and process control will be investigated. Supplementary experiments will be carried out at the Idaho National Engineering Laboratory and Sandia National Laboratory to expand and clarify results obtained on the Tritium Plasma Experiment.

Development & characterization of alumina coating by atmospheric plasma spraying

NASA Astrophysics Data System (ADS)

Sebastian, Jobin; Scaria, Abyson; Kurian, Don George

2018-03-01

Ceramic coatings are applied on metals to prevent them from oxidation and corrosion at room as well as elevated temperatures. The service environment, mechanisms of protection, chemical and mechanical compatibility, application method, control of coating quality and ability of the coating to be repaired are the factors that need to be considered while selecting the required coating. The coatings based on oxide materials provides high degree of thermal insulation and protection against oxidation at high temperatures for the underlying substrate materials. These coatings are usually applied by the flame or plasma spraying methods. The surface cleanliness needs to be ensured before spraying. Abrasive blasting can be used to provide the required surface roughness for good adhesion between the substrate and the coating. A pre bond coat like Nickel Chromium can be applied on to the substrate material before spraying the oxide coating to avoid chances of poor adhesion between the oxide coating and the metallic substrate. Plasma spraying produces oxide coatings of greater density, higher hardness, and smooth surface finish than that of the flame spraying process Inert gas is often used for generation of plasma gas so as to avoid the oxidation of the substrate material. The work focuses to develop, characterize and optimize the parameters used in Al2O3 coating on transition stainless steel substrate material for minimizing the wear rate and maximizing the leak tightness using plasma spray process. The experiment is designed using Taguchi’s L9 orthogonal array. The parameters that are to be optimized are plasma voltage, spraying distance and the cooling jet pressure. The characterization techniques includes micro-hardness and porosity tests followed by Grey relational analysis of the results.

Fission and activation of uranium by fusion-plasma neutrons

NASA Technical Reports Server (NTRS)

Lee, J. H.; Hohl, F.; Mcfarland, D. R.

1978-01-01

Fusion-fission hybrid reactors are discussed in terms of two main purposes: to breed fissile materials (Pu 233 and Th 233 from U 238 or Th 232) for use in low-reactivity breeders, and to produce tritium from lithium to refuel fusion plasma cores. Neutron flux generation is critical for both processes. Various methods for generating the flux are described, with attention to new geometries for multiple plasma focus arrays, e.g., hypocycloidal pinch and staged plasma focus devices. These methods are evaluated with reference to their applicability to D-D fusion reactors, which will ensure a virtually unlimited energy supply. Accurate observations of the neutron flux from such schemes are obtained by using different target materials in the plasma focus.

Development of an inductively coupled impulse sputtering source for coating deposition

NASA Astrophysics Data System (ADS)

Loch, Daniel Alexander Llewellyn

In recent years, highly ionised pulsed plasma processes have had a great impact on improving the coating performance of various applications, such as for cutting tools and ITO coatings, allowing for a longer service life and improved defect densities. These improvements stem from the higher ionisation degree of the sputtered material in these processes and with this the possibility of controlling the flux of sputtered material, allowing the regulation of the hardness and density of coatings and the ability to sputter onto complex contoured substrates. The development of Inductively Coupled Impulse Sputtering (ICIS) is aimed at the potential of utilising the advantages of highly ionised plasma for the sputtering of ferromagnetic material. In traditional magnetron based sputter processes ferromagnetic materials would shunt the magnetic field of the magnetron, thus reducing the sputter yield and ionisation efficiency. By generating the plasma within a high power pulsed radio frequency (RF) driven coil in front of the cathode, it is possible to remove the need for a magnetron by applying a high voltage pulsed direct current to the cathode attracting argon ions from the plasma to initiate sputtering. This is the first time that ICIS technology has been deployed in a sputter coating system. To study the characteristics of ICIS, current and voltage waveforms have been measured to examine the effect of increasing RF-power. Plasma analysis has been conducted by optical emission spectroscopy to investigate the excitation mechanisms and the emission intensity. These are correlated to the set RF-power by modelling assumptions based on electron collisions. Mass spectroscopy is used to measure the plasma potential and ion energy distribution function. Pure copper, titanium and nickel coatings have been deposited on silicon with high aspect ratio via to measure the deposition rate and characterise the microstructure. For titanium and nickel the emission modelling results are in good agreement with the model expectations showing that electron collisions are the main excitation mechanism. The plasma potential was measured as 20 eV, this is an ideal level for good adatom mobility with reduced lattice defects. All surfaces in the via were coated, perpendicular column growth on the sidewalls indicates a predominantly ionised metal flux to the substrate and the deposition rates agree with the literature value of the sputter yield of the materials. The results of the studies show that ICIS is a viable process for the deposition of magnetic coatings with high ionisation in the plasma.

EDITORIAL: Non-thermal plasma-assisted fuel conversion for green chemistry Non-thermal plasma-assisted fuel conversion for green chemistry

NASA Astrophysics Data System (ADS)

Nozaki, Tomohiro; Gutsol, Alexander

2011-07-01

This special issue is based on the symposium on Non-thermal Plasma Assisted Fuel Conversion for Green Chemistry, a part of the 240th ACS National Meeting & Exposition held in Boston, MA, USA, 22-26 August 2010. Historically, the Division of Fuel Chemistry of the American Chemical Society (ACS) has featured three plasma-related symposia since 2000, and has launched special issues in Catalysis Today on three occasions: 'Catalyst Preparation using Plasma Technologies', Fall Meeting, Washington DC, USA, 2000. Special issue in Catalysis Today 72 (3-4) with 12 peer-reviewed articles. 'Plasma Technology and Catalysis', Spring Meeting, New Orleans, LA, USA, 2003. Special issue in Catalysis Today 89 (1-2) with more than 30 peer-reviewed articles. 'Utilization of Greenhouse Gases II' (partly focused on plasma-related technologies), Spring Meeting, Anaheim, CA, USA, 2004. Special issue in Catalysis Today 98 (4) with 25 peer-reviewed articles. This time, selected presentations are published in this Journal of Physics D: Applied Physics special issue. An industrial material and energy conversion technology platform is established on thermochemical processes including various catalytic reactions. Existing industry-scale technology is already well established; nevertheless, further improvement in energy efficiency and material saving has been continuously demanded. Drastic reduction of CO2 emission is also drawing keen attention with increasing recognition of energy and environmental issues. Green chemistry is a rapidly growing research field, and frequently highlights renewable bioenergy, bioprocesses, solar photocatalysis of water splitting, and regeneration of CO2 into useful chemicals. We would also like to emphasize 'plasma catalysis' of hydrocarbon resources as an important part of the innovative next-generation green technologies. The peculiarity of non-thermal plasma is that it can generate reactive species almost independently of reaction temperature. Plasma-generated reactive species are used to initiate chemical reactions at unexpectedly lower temperatures than conventional thermochemical reactions, leading to non-equilibrium product distribution or creating unconventional reaction pathways. When non-thermal plasma is combined with catalysts, a synergistic effect is frequently observed. Such unique properties of non-thermal plasma are expected to contribute excellent control over process parameters that meet the need for energy saving, environment protection, and material preservation. This special issue consists of eleven peer-reviewed papers including two invited publications. Professors Alexander Fridman and Alexander Rabinovich from Drexel University, and Dr Gutsol from the Chevron Energy Technology Company present a critical review of various industry-oriented practical plasma fuel conversion processes. Professor Richard Mallinson from University of Oklahoma describes his recent project on E85 (85%-ethanol/15%-gasoline) upgrading using non-thermal plasma and catalyst hybrid reactor, and highlights the synergistic effect on fuel conversion processes. Other papers focus on plasma/catalyst hybrid reactions for methane dry (CO2) reforming, plasma synthesis of carbon suboxide polymer from CO, the gas-to-liquid (GTL) process using a non-thermal plasma-combined micro-chemical reactor, and molecular beam characterization of plasma-generated reactive species. Much research regarding plasma catalysis is ongoing worldwide, but there is plenty of room for further development of plasma fuel processing, which could eventually provide a viable and flexible solution in future energy and material use. Finally, we would like to thank all symposium participants for their active discussion. We appreciate the sponsorship of the Division of Fuel Chemistry of the American Chemical Society. We express special thanks to the program chair of the Fuel Chemistry Division, Professor Chang-jun Liu at Tianjin University, for his dedication to the success of the symposium. We particularly express our appreciation to the Editorial Board of Journal of Physics D: Applied Physics for publication of the special issue.

Large Volume Non-Equilibrium Air Plasma at Atmospheric Pressure: A Novel Method with Low Power Requirements

DTIC Science & Technology

2007-02-28

of magnitude in size. Also unlike corona -like devices such as the plasma needle , which generates 2-3 mm long plasma at the tip of a sharp wire...Distribution Unlimited Table of Contents Abstract AC System with Water Electrode Current voltage characteristics Plasma diagnostics results Experimental setup...Laroussi, PI. 4 AC SYSTEM WITH WATER ELECTRODE Recently, non-equilibrium atmospheric pressure plasmas have been used in a variety of material processing

Process for forming planarized films

DOEpatents

Pang, Stella W.; Horn, Mark W.

1991-01-01

A planarization process and apparatus which employs plasma-enhanced chemical vapor deposition (PECVD) to form plarnarization films of dielectric or conductive carbonaceous material on step-like substrates.

Analysis of the correlation between plasma plume and keyhole behavior in laser metal welding for the modeling of the keyhole geometry

NASA Astrophysics Data System (ADS)

Tenner, F.; Brock, C.; Klämpfl, F.; Schmidt, M.

2015-01-01

The process of laser metal welding is widely used in industry. Nevertheless, there is still a lack of complete process understanding and control. For analyzing the process we used two high-speed cameras. Therefore, we could image the plasma plume (which is directly accessible by a camera) and the keyhole (where most of the process instabilities occur) during laser welding isochronously. Applying different image processing steps we were able to find a correlation between those two process characteristics. Additionally we imaged the plasma plume from two directions and were able to calculate a volume with respect to the vaporized material the plasma plume carries. Due to these correlations we are able to conclude the keyhole stability from imaging the plasma plume and vice versa. We used the found correlation between the keyhole behavior and the plasma plume to explain the effect of changing laser power and feed rate on the keyhole geometry. Furthermore, we tried to outline the phenomena which have the biggest effect on the keyhole geometry during changes of feed rate and laser power.

Machinability of nickel based alloys using electrical discharge machining process

NASA Astrophysics Data System (ADS)

Khan, M. Adam; Gokul, A. K.; Bharani Dharan, M. P.; Jeevakarthikeyan, R. V. S.; Uthayakumar, M.; Thirumalai Kumaran, S.; Duraiselvam, M.

2018-04-01

The high temperature materials such as nickel based alloys and austenitic steel are frequently used for manufacturing critical aero engine turbine components. Literature on conventional and unconventional machining of steel materials is abundant over the past three decades. However the machining studies on superalloy is still a challenging task due to its inherent property and quality. Thus this material is difficult to be cut in conventional processes. Study on unconventional machining process for nickel alloys is focused in this proposed research. Inconel718 and Monel 400 are the two different candidate materials used for electrical discharge machining (EDM) process. Investigation is to prepare a blind hole using copper electrode of 6mm diameter. Electrical parameters are varied to produce plasma spark for diffusion process and machining time is made constant to calculate the experimental results of both the material. Influence of process parameters on tool wear mechanism and material removal are considered from the proposed experimental design. While machining the tool has prone to discharge more materials due to production of high energy plasma spark and eddy current effect. The surface morphology of the machined surface were observed with high resolution FE SEM. Fused electrode found to be a spherical structure over the machined surface as clumps. Surface roughness were also measured with surface profile using profilometer. It is confirmed that there is no deviation and precise roundness of drilling is maintained.

Plasma Processing of Materials

DTIC Science & Technology

1985-02-22

inert gas or in a reduced pressure environment) one can obtain rapidly solidified metastable (i.e., amorphous, microcrystalline, and supersaturated...integrated circuits dnd thus is an area of’vital : importance to our electronics industry. Applications utilizing noble gas plasmas, such as ion-plating...phenomena and probably will not benefit -ubstantially from acditional basic research. Applications utilizing molecular gas plasmas, where reactive species

Thermal Plasma Synthesis of Crystalline Gallium Nitride Nanopowder from Gallium Nitrate Hydrate and Melamine

PubMed Central

Kim, Tae-Hee; Choi, Sooseok; Park, Dong-Wha

2016-01-01

Gallium nitride (GaN) nanopowder used as a blue fluorescent material was synthesized by using a direct current (DC) non-transferred arc plasma. Gallium nitrate hydrate (Ga(NO3)3∙xH2O) was used as a raw material and NH3 gas was used as a nitridation source. Additionally, melamine (C3H6N6) powder was injected into the plasma flame to prevent the oxidation of gallium to gallium oxide (Ga2O3). Argon thermal plasma was applied to synthesize GaN nanopowder. The synthesized GaN nanopowder by thermal plasma has low crystallinity and purity. It was improved to relatively high crystallinity and purity by annealing. The crystallinity is enhanced by the thermal treatment and the purity was increased by the elimination of residual C3H6N6. The combined process of thermal plasma and annealing was appropriate for synthesizing crystalline GaN nanopowder. The annealing process after the plasma synthesis of GaN nanopowder eliminated residual contamination and enhanced the crystallinity of GaN nanopowder. As a result, crystalline GaN nanopowder which has an average particle size of 30 nm was synthesized by the combination of thermal plasma treatment and annealing. PMID:28344295

Investigation of low cost material processes for liquid rocket engines

NASA Technical Reports Server (NTRS)

Nguyentat, Thinh; Kawashige, Chester M.; Scala, James G.; Horn, Ronald M.

1993-01-01

The development of low cost material processes is essential to the achievement of economical liquid rocket propulsion systems in the next century. This paper will present the results of the evaluation of some promising material processes including powder metallurgy, vacuum plasma spray, metal spray forming, and bulge forming. The physical and mechanical test results from the samples and subscale hardware fabricated from high strength copper alloys and superalloys will be discussed.

Micro glow plasma for localized nanostructural modification of carbon nanotube forest

NASA Astrophysics Data System (ADS)

Sarwar, Mirza Saquib us; Xiao, Zhiming; Saleh, Tanveer; Nojeh, Alireza; Takahata, Kenichi

2016-08-01

This paper reports the localized selective treatment of vertically aligned carbon nanotubes, or CNT forests, for radial size modification of the nanotubes through a micro-scale glow plasma established on the material. An atmospheric-pressure DC glow plasma is shown to be stably sustained on the surface of the CNT forest in argon using micromachined tungsten electrodes with diameters down to 100 μm. Experiments reveal thinning or thickening of the nanotubes under the micro glow depending on the process conditions including discharge current and process time. These thinning and thickening effects in the treated nanotubes are measured to be up to ˜30% and ˜300% in their diameter, respectively, under the tested conditions. The elemental and Raman analyses suggest that the treated region of the CNT forest is pure carbon and maintains a degree of crystallinity. The local plasma treatment process investigated may allow modification of material characteristics in different domains for targeted regions or patterns, potentially aiding custom design of micro-electro-mechanical systems and other emerging devices enabled by the CNT forest.

Micro glow plasma for localized nanostructural modification of carbon nanotube forest

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sarwar, Mirza Saquib us; Xiao, Zhiming; Saleh, Tanveer

2016-08-22

This paper reports the localized selective treatment of vertically aligned carbon nanotubes, or CNT forests, for radial size modification of the nanotubes through a micro-scale glow plasma established on the material. An atmospheric-pressure DC glow plasma is shown to be stably sustained on the surface of the CNT forest in argon using micromachined tungsten electrodes with diameters down to 100 μm. Experiments reveal thinning or thickening of the nanotubes under the micro glow depending on the process conditions including discharge current and process time. These thinning and thickening effects in the treated nanotubes are measured to be up to ∼30% andmore » ∼300% in their diameter, respectively, under the tested conditions. The elemental and Raman analyses suggest that the treated region of the CNT forest is pure carbon and maintains a degree of crystallinity. The local plasma treatment process investigated may allow modification of material characteristics in different domains for targeted regions or patterns, potentially aiding custom design of micro-electro-mechanical systems and other emerging devices enabled by the CNT forest.« less

Plasma - enhanced dispersion of metal and ceramic nanoparticles in polymer nanocomposite films

NASA Astrophysics Data System (ADS)

Maguire, Paul; Liu, Yazi; Askari, Sadegh; Patel, Jenish; Macia-Montero, Manuel; Mitra, Somak; Zhang, Richao; Sun, Dan; Mariotti, Davide

2015-09-01

In this work we demonstrate a facile method to synthesize a nanoparticle/PEDOT:PSS hybrid nanocomposite material in aqueous solution through atmospheric pressure direct current (DC) plasma processing at room temperature. Both metal (Au) and ceramic (TiO2) nanoparticle composite films have been fabricated. Nanoparticle dispersion is enhanced considerable and remains stable. TiO2/polymer hybrid nanoparticles with a distinct core shell structure have been obtained. Increased nanoparticle/PEDOT:PSS nanocomposite electrical conductivity has been observed. The improvement in nanocomposite properties is due to the enhanced dispersion and stability in liquid polymer of microplasma processed Au or TiO2 nanoparticles. Both plasma induced surface charge and nanoparticle surface termination with specific plasma chemical species are thought to provide an enhanced barrier to nanoparticle agglomeration and promote nanoparticle-polymer bonding. This is expected to have a significant benefit in materials processing with inorganic nanoparticles for applications in energy storage, photocatalysis and biomedical sensors. Engineering and Physical Sciences Research Council (EPSRC: EP/K006088/1, EP/K006142, Nos. EP/K022237/1).

Surface treatment of ceramic articles

DOEpatents

Komvopoulos, Kyriakos; Brown, Ian G.; Wei, Bo; Anders, Simone; Anders, Andre; Bhatia, C. Singh

1998-01-01

A process for producing an article with improved ceramic surface properties including providing an article having a ceramic surface, and placing the article onto a conductive substrate holder in a hermetic enclosure. Thereafter a low pressure ambient is provided in the hermetic enclosure. A plasma including ions of solid materials is produced the ceramic surface of the article being at least partially immersed in a macroparticle free region of the plasma. While the article is immersed in the macroparticle free region, a bias of the substrate holder is biased between a low voltage at which material from the plasma condenses on the surface of the article and a high negative voltage at which ions from the plasma are implanted into the article.

Plasma-water interactions at atmospheric pressure in a dc microplasma

NASA Astrophysics Data System (ADS)

Patel, Jenish; Němcová, Lucie; Mitra, Somak; Graham, William; Maguire, Paul; Švrček, Vladimir; Mariotti, Davide

2013-09-01

Plasma-liquid interactions generate a variety of chemical species that are very useful for the treatment of many materials and that makes plasma-induced liquid chemistry (PiLC) very attractive for industrial applications. The understanding of plasma-induced chemistry with water can open up a vast range of plasma-activated chemistry in liquid with enormous potential for the synthesis of chemical compounds, nanomaterials synthesis and functionalization. However, this basic understanding of the chemistry occurring at the plasma-liquid interface is still poor. In the present study, different properties of water are analysed when processed by plasma at atmospheric-pressure with different conditions. In particular, pH, temperature and conductivity of water are measured against current and time of plasma processing. We also observed the formation of molecular oxygen (O2) and hydrogen peroxide (H2O2) for the same plasma conditions. The current of plasma processing was found to affect the water properties and the production of hydrogen peroxide in water. The relation between the number of electrons injected from plasma in water and the number of H2O2 molecules was established and based on these results a scenario of reactions channels activated by plasma-water interface is concluded.

Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces

DOEpatents

Carr,; Jeffrey, W [Livermore, CA

2009-03-31

Fabrication apparatus and methods are disclosed for shaping and finishing difficult materials with no subsurface damage. The apparatus and methods use an atmospheric pressure mixed gas plasma discharge as a sub-aperture polisher of, for example, fused silica and single crystal silicon, silicon carbide and other materials. In one example, workpiece material is removed at the atomic level through reaction with fluorine atoms. In this example, these reactive species are produced by a noble gas plasma from trace constituent fluorocarbons or other fluorine containing gases added to the host argon matrix. The products of the reaction are gas phase compounds that flow from the surface of the workpiece, exposing fresh material to the etchant without condensation and redeposition on the newly created surface. The discharge provides a stable and predictable distribution of reactive species permitting the generation of a predetermined surface by translating the plasma across the workpiece along a calculated path.

Thin film coating process using an inductively coupled plasma

DOEpatents

Kniseley, Richard N.; Schmidt, Frederick A.; Merkle, Brian D.

1990-01-30

Thin coatings of normally solid materials are applied to target substrates using an inductively coupled plasma. Particles of the coating material are vaporized by plasma heating, and pass through an orifice to a first vacuum zone in which the particles are accelerated to a velocity greater than Mach 1. The shock wave generated in the first vacuum zone is intercepted by the tip of a skimmer cone that provides a second orifice. The particles pass through the second orifice into a second zone maintained at a higher vacuum and impinge on the target to form the coating. Ultrapure coatings can be formed.

Investigation of the AC Plasma Torch Working Conditions for the Plasma Chemical Applications

NASA Astrophysics Data System (ADS)

Safronov, A. A.; Vasilieva, O. B.; Dudnik, J. D.; E Kuznetsov, V.; Shiryaev, V. N.; Subbotin, D. I.; Pavlov, A. V.

2017-04-01

The presented design and parameters of a three-phase AC plasma torch with the power up to 500 kW, flow rate of air 30-50 g/s (temperature up to 5000 K) could be used in different plasma chemical processes. Range of measured plasma temperature is 3500-5000 K. The paper presents investigations of the plasma torch operation modes for its application in plasma chemical technologies. Plasma chemical technologies for various purposes (processing, destruction of various wastes, including technological and hazardous waste, conversion or production of chemicals to obtain nanoscale materials, etc.) are very promising in terms of the process efficiency. Their industrial use is difficult due to the lack of inexpensive and reliable plasma torches providing the desired level of temperature, enthalpy of the working gas and other necessary conditions for the process. This problem can be solved using a considered design of a three-phase alternating current plasma torch with power of 150-500 kW with working gas flow rate of 30-50 g/s with mass average temperature up to 5000K on the basis of which an industrial plasma chemical plant can be created. The basis of the plasma torch operation is a railgun effect that is the principle of arc movement in the field of its own current field. Thanks to single supply of power to the arc, arcs forming in the discharge chamber of the plasma torch move along the electrodes under the action of electrodynamic forces resulting from the interaction of the arc current with its own magnetic field. Under the condition of the three-phase supply voltage, arc transits from the electrode to the electrode with change in the anodic and cathodic phases with frequency of 300 Hz. A special feature of this design is the ability to organize the movement of the arc attachment along the electrode, thus ensuring an even distribution of the thermal load and thus achieve long time of continuous operation of the plasma torch. The parameters of the plasma jet of the plasma torch and the single-phase three-phase plasma injector for use in a plasma-chemical unit for production of nano-dispersed materials are described in the paper.

Robust Low-Cost Cathode for Commercial Applications

NASA Technical Reports Server (NTRS)

Patterson, Michael J.

2007-01-01

Under funding from the NASA Commercial Technology Office, a cathode assembly was designed, developed, fabricated, and tested for use in plasma sources for ground-based materials processing applications. The cathode development activity relied on the large prior NASA investment and successful development of high-current, high-efficiency, long-life hollow cathodes for use on the International Space Station Plasma Contactor System. The hollow cathode was designed and fabricated based on known engineering criteria and manufacturing processes for compatibility with the requirements of the plasma source. The transfer of NASA GRC-developed hollow cathode technology for use as an electron emitter in the commercial plasma source is anticipated to yield a significant increase in process control, while eliminating the present issues of electron emitter lifetime and contamination.

Very Large Area/Volume Microwave ECR Plasma and Ion Source

NASA Technical Reports Server (NTRS)

Foster, John E. (Inventor); Patterson, Michael J. (Inventor)

2009-01-01

The present invention is an apparatus and method for producing very large area and large volume plasmas. The invention utilizes electron cyclotron resonances in conjunction with permanent magnets to produce dense, uniform plasmas for long life ion thruster applications or for plasma processing applications such as etching, deposition, ion milling and ion implantation. The large area source is at least five times larger than the 12-inch wafers being processed to date. Its rectangular shape makes it easier to accommodate to materials processing than sources that are circular in shape. The source itself represents the largest ECR ion source built to date. It is electrodeless and does not utilize electromagnets to generate the ECR magnetic circuit, nor does it make use of windows.

Advances in induction-heated plasma torch technology

NASA Technical Reports Server (NTRS)

Poole, J. W.; Vogel, C. E.

1972-01-01

Continuing research has resulted in significant advances in induction-heated plasma torch technology which extend and enhance its potential for broad range of uses in chemical processing, materials development and testing, and development of large illumination sources. Summaries of these advances are briefly described.

Non-Equilibrium Plasma Processing for the Preparation of Antibacterial Surfaces

PubMed Central

Sardella, Eloisa; Palumbo, Fabio; Camporeale, Giuseppe; Favia, Pietro

2016-01-01

Non-equilibrium plasmas offer several strategies for developing antibacterial surfaces that are able to repel and/or to kill bacteria. Due to the variety of devices, implants, and materials in general, as well as of bacteria and applications, plasma assisted antibacterial strategies need to be tailored to each specific surface. Nano-composite coatings containing inorganic (metals and metal oxides) or organic (drugs and biomolecules) compounds can be deposited in one step, and used as drug delivery systems. On the other hand, functional coatings can be plasma-deposited and used to bind antibacterial molecules, for synthesizing surfaces with long lasting antibacterial activity. In addition, non-fouling coatings can be produced to inhibit the adhesion of bacteria and reduce the formation of biofilm. This paper reviews plasma-based strategies aimed to reduce bacterial attachment and proliferation on biomedical materials and devices, but also onto materials used in other fields. Most of the activities described have been developed in the lab of the authors. PMID:28773637

Deep Etching Process Developed for the Fabrication of Silicon Carbide Microsystems

NASA Technical Reports Server (NTRS)

Beheim, Glenn M.

2000-01-01

Silicon carbide (SiC), because of its superior electrical and mechanical properties at elevated temperatures, is a nearly ideal material for the microminiature sensors and actuators that are used in harsh environments where temperatures may reach 600 C or greater. Deep etching using plasma methods is one of the key processes used to fabricate silicon microsystems for more benign environments, but SiC has proven to be a more difficult material to etch, and etch depths in SiC have been limited to several micrometers. Recently, the Sensors and Electronics Technology Branch at the NASA Glenn Research Center at Lewis Field developed a plasma etching process that was shown to be capable of etching SiC to a depth of 60 mm. Deep etching of SiC is achieved by inductive coupling of radiofrequency electrical energy to a sulfur hexafluoride (SF6) plasma to direct a high flux of energetic ions and reactive fluorine atoms to the SiC surface. The plasma etch is performed at a low pressure, 5 mtorr, which together with a high gas throughput, provides for rapid removal of the gaseous etch products. The lateral topology of the SiC microstructure is defined by a thin film of etch-resistant material, such as indium-tin-oxide, which is patterned using conventional photolithographic processes. Ions from the plasma bombard the exposed SiC surfaces and supply the energy needed to initiate a reaction between SiC and atomic fluorine. In the absence of ion bombardment, no reaction occurs, so surfaces perpendicular to the wafer surface (the etch sidewalls) are etched slowly, yielding the desired vertical sidewalls.

Spark plasma sintering of pure and doped tungsten as plasma facing material

NASA Astrophysics Data System (ADS)

Autissier, E.; Richou, M.; Minier, L.; Naimi, F.; Pintsuk, G.; Bernard, F.

2014-04-01

In the current water cooled divertor concept, tungsten is an armour material and CuCrZr is a structural material. In this work, a fabrication route via a powder metallurgy process such as spark plasma sintering is proposed to fully control the microstructure of W and W composites. The effect of chemical composition (additives) and the powder grain size was investigated. To reduce the sintering temperature, W powders doped with a nano-oxide dispersion of Y2O3 are used. Consequently, the sintering temperature for W-oxide dispersed strengthened (1800 °C) is lower than for pure W powder. Edge localized mode tests were performed on pure W and compared to other preparation techniques and showed promising results.

Foundations of atmospheric pressure non-equilibrium plasmas

NASA Astrophysics Data System (ADS)

Bruggeman, Peter J.; Iza, Felipe; Brandenburg, Ronny

2017-12-01

Non-equilibrium plasmas have been intensively studied over the past century in the context of material processing, environmental remediation, ozone generation, excimer lamps and plasma display panels. Research on atmospheric pressure non-equilibrium plasmas intensified over the last two decades leading to a large variety of plasma sources that have been developed for an extended application range including chemical conversion, medicine, chemical analysis and disinfection. The fundamental understanding of these discharges is emerging but there remain a lot of unexplained phenomena in these intrinsically complex plasmas. The properties of non-equilibrium plasmas at atmospheric pressure span over a huge range of electron densities as well as heavy particle and electron temperatures. This paper provides an overview of the key underlying processes that are important for the generation and stabilization of atmospheric pressure non-equilibrium plasmas. The unique physical and chemical properties of theses discharges are also summarized.

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

PubMed Central

2018-01-01

Oxide and nitride thin-films of Ti, Hf, and Si serve numerous applications owing to the diverse range of their material properties. It is therefore imperative to have proper control over these properties during materials processing. Ion-surface interactions during plasma processing techniques can influence the properties of a growing film. In this work, we investigated the effects of controlling ion characteristics (energy, dose) on the properties of the aforementioned materials during plasma-enhanced atomic layer deposition (PEALD) on planar and 3D substrate topographies. We used a 200 mm remote PEALD system equipped with substrate biasing to control the energy and dose of ions by varying the magnitude and duration of the applied bias, respectively, during plasma exposure. Implementing substrate biasing in these forms enhanced PEALD process capability by providing two additional parameters for tuning a wide range of material properties. Below the regimes of ion-induced degradation, enhancing ion energies with substrate biasing during PEALD increased the refractive index and mass density of TiOx and HfOx and enabled control over their crystalline properties. PEALD of these oxides with substrate biasing at 150 °C led to the formation of crystalline material at the low temperature, which would otherwise yield amorphous films for deposition without biasing. Enhanced ion energies drastically reduced the resistivity of conductive TiNx and HfNx films. Furthermore, biasing during PEALD enabled the residual stress of these materials to be altered from tensile to compressive. The properties of SiOx were slightly improved whereas those of SiNx were degraded as a function of substrate biasing. PEALD on 3D trench nanostructures with biasing induced differing film properties at different regions of the 3D substrate. On the basis of the results presented herein, prospects afforded by the implementation of this technique during PEALD, such as enabling new routes for topographically selective deposition on 3D substrates, are discussed. PMID:29554799

Improvement of the adsorption of quaternary ammonium on polypropylene affinity membrane through the control of its surface properties.

PubMed

Hachache, Naima; Bal, Youcef; Debarnot, Dominique; Poncin-Epaillard, Fabienne

2014-02-01

Polypropylene fiber meshes were plasma-treated in order to attach new chemical functions corresponding to acidic or basic groups without altering the roughness of such thin material. An almost complete wettability of these plasma-treated materials is obtained. Because of the plasma-grafting of acid or amino moieties, such surface treatment allows increasing the adsorption rate of quaternary ammonium molecule like Aliquat 336. This increase was explained by specific interactions of ammonium head of the Aliquat 336 and hydrophilic group of plasma-treated PP, followed by the adsorption of a further layer of Aliquat 336 through hydrophobic interactions of its hydrocarbon chain. These interactions between the carrier and the polymeric surface were characterized leading to physisorption mechanism. Such new material could be applied to the extraction process since no evidence of aging was given. Copyright © 2013 Elsevier B.V. All rights reserved.

Atmospheric-Pressure Cold Plasmas Used to Embed Bioactive Compounds in Matrix Material for Active Packaging of Fruits and Vegetables

NASA Astrophysics Data System (ADS)

Fernandez, Sulmer; Pedrow, Patrick; Powers, Joseph; Pitts, Marvin

2009-10-01

Active thin film packaging is a technology with the potential to provide consumers with new fruit and vegetable products-if the film can be applied without deactivating bioactive compounds.Atmospheric pressure cold plasma (APCP) processing can be used to activate monomer with concomitant deposition of an organic plasma polymerized matrix material and to immobilize a bioactive compound all at or below room temperature.Aims of this work include: 1) immobilize an antimicrobial in the matrix; 2) determine if the antimicrobial retains its functionality and 3) optimize the reactor design.The plasma zone will be obtained by increasing the voltage on an electrode structure until the electric field in the feed material (argon + monomer) yields electron avalanches. Results will be described using Red Delicious apples.Prospective matrix precursors are vanillin and cinnamic acid.A prospective bioactive compound is benzoic acid.

Combined slurry and cavitation erosion resistance of surface modified SS410 stainless steel

NASA Astrophysics Data System (ADS)

Amarendra, H. J.; Pratap, M. S.; Karthik, S.; Punitha Kumara, M. S.; Rajath, H. C.; Ranjith, H.; Shubhatunga, S. V.

2018-03-01

Slurry erosion and combined slurry and cavitation erosion resistance of thermal spray coatings are studied and compared with the as-received martensitic stainless steel material. 70Ni-Cr coatings are deposited on SS 410 material through plasma thermal spray process. The synergy effect of the combined slurry and cavitation erosion resistance of plasma thermal spray coatings were investigated in a slurry pot tester in the presence of bluff bodies known as Cavitation Inducers. Results showed the combined slurry and cavitation erosion resistance of martensitic stainless steel - 410 can be improved by plasma thermal spray coating. It is observed that the plasma spray coated specimens are better erosion resistant than the as- received material, subjected to erosion test under similar conditions. As-received and the surface modified steels are mechanically characterized for its hardness, bending. Morphological studies are conducted through scanning electron microscope.

Microgravity Production of Nanoparticles of Novel Materials Using Plasma Synthesis

NASA Technical Reports Server (NTRS)

Frenklach, Michael; Fernandez-Pello, Carlos

2001-01-01

The research goal is to study the formation in reduced gravity of high quality nanoparticulate of novel materials using plasma synthesis. Particular emphasis will be placed on the production of powders of non-oxide materials like diamond, SiC, SiN, c-BN, etc. The objective of the study is to investigate the effect of gravity on plasma synthesis of these materials, and to determine how the microgravity synthesis can improve the quality and yield of the nanoparticles. It is expected that the reduced gravity will aid in the understanding of the controlling mechanisms of plasma synthesis, and will increase the yield, and quality of the synthesized powder. These materials have properties of interest in several industrial applications, such as high temperature load bearings or high speed metal machining. Furthermore, because of the nano-meter size of the particulate produced in this process, they have specific application in the fabrication of MEMS based combustion systems, and in the development and growth of nano-systems and nano-structures of these materials. These are rapidly advancing research areas, and there is a great need for high quality nanoparticles of different materials. One of the primary systems of interest in the project will be gas-phase synthesis of nanopowder of non-oxide materials.

Process Research of Polycrystalline Silicon Material (PROPSM)

NASA Technical Reports Server (NTRS)

Culik, J. S.

1984-01-01

A passivation process (hydrogenation) that will improve the power generation of solar cells fabricated from presently produced, large grain, cast polycrystalline silicon (Semix), a potentially low cost material are developed. The first objective is to verify the operation of a DC plasma hydrogenation system and to investigate the effect of hydrogen on the electrical performance of a variety of polycrystalline silicon solar cells. The second objective is to parameterize and optimize a hydrogenation process for cast polycrystalline silicon, and will include a process sensitivity analysis. The sample preparation for the first phase is outlined. The hydrogenation system is described, and some early results that were obtained using the hydrogenation system without a plasma are summarized. Light beam induced current (LBIC) measurements of minicell samples, and their correlation to dark current voltage characteristics, are discussed.

Plasma arc welding repair of space flight hardware

NASA Technical Reports Server (NTRS)

Hoffman, David S.

1993-01-01

A technique to weld repair the main combustion chamber of Space Shuttle Main Engines has been developed. The technique uses the plasma arc welding process and active cooling to seal cracks and pinholes in the hot-gas wall of the main combustion chamber liner. The liner hot-gas wall is made of NARloy-Z, a copper alloy previously thought to be unweldable using conventional arc welding processes. The process must provide extensive heat input to melt the high conductivity NARloy-Z while protecting the delicate structure of the surrounding material. The higher energy density of the plasma arc process provides the necessary heat input while active water cooling protects the surrounding structure. The welding process is precisely controlled using a computerized robotic welding system.

Columnar-Structured Mg-Al-Spinel Thermal Barrier Coatings (TBCs) by Suspension Plasma Spraying (SPS)

NASA Astrophysics Data System (ADS)

Schlegel, N.; Ebert, S.; Mauer, G.; Vaßen, R.

2015-01-01

The suspension plasma spraying (SPS) process has been developed to permit the feeding of sub-micrometer-sized powder into the plasma plume. In contrast to electron beam-physical vapor deposition and plasma spray-physical vapor deposition, SPS enables the cost-efficient deposition of columnar-structured coatings. Due to their strain tolerance, these coatings play an important role in the field of thermal barrier coatings (TBCs). In addition to the cost-efficient process, attention was turned to the TBC material. Nowadays, yttria partially stabilized zirconia (YSZ) is used as standard TBC material. However, its long-term application at temperatures higher than 1200 °C is problematic. At these high temperatures, phase transitions and sintering effects lead to the degradation of the TBC system. To overcome those deficits of YSZ, Mg-Al-spinel was chosen as TBC material. Even though it has a lower melting point (~2135 °C) and a higher thermal conductivity (~2.5 W/m/K) than YSZ, Mg-Al-spinel provides phase stability at high temperatures in contrast to YSZ. The Mg-Al-spinel deposition by SPS resulted in columnar-structured coatings, which have been tested for their thermal cycling lifetime. Furthermore, the influence of substrate cooling during the spraying process on thermal cycling behavior, phase composition, and stoichiometry of the Mg-Al-spinel has been investigated.

Effect of novel food processing methods on packaging: structure, composition, and migration properties.

PubMed

Guillard, V; Mauricio-Iglesias, M; Gontard, N

2010-11-01

Classical stabilization techniques (thermal treatments) usually involve food to be packed after being processed. On the contrary and increasingly, novel food processing methods, such as high pressure or microwaves, imply that both packaging and foodstuff undergo the stabilization treatment. Moreover, novel treatments (UV light, irradiation, ozone, cold plasma) are specifically used for disinfection and sterilization of the packaging material itself. Therefore, in the last several years a number of papers have focused on the effects of these new treatments on food-packaging interactions with a special emphasis on chemical migration and safety concerns. New packaging materials merged on the market with specific interest regarding the environment (i.e. bio-sourced materials) or mechanical and barrier properties (i.e. nanocomposites packaging materials). It is time to evaluate the knowledge about how these in-package food technologies affect food/packaging interactions, and especially for novel biodegradable and/or active materials. This article presents the effect of high pressure treatment, microwave heating, irradiation, UV-light, ozone and, cold plasma treatment on food/packaging interactions.

Recent developments in plasma spray processes for applications in energy technology

NASA Astrophysics Data System (ADS)

Mauer, G.; Jarligo, M. O.; Marcano, D.; Rezanka, S.; Zhou, D.; Vaßen, R.

2017-03-01

This work focuses on recent developments of plasma spray processes with respect to specific demands in energy technology. High Velocity Atmospheric Plasma Spraying (HV-APS) is a novel variant of plasma spraying devoted to materials which are prone to oxidation or decomposition. It is shown how this process can be used for metallic bondcoats in thermal barrier coating systems. Furthermore, Suspension Plasma Spraying (SPS) is a new method to process submicron-sized feedstock powders which are not sufficiently flowable to feed them in dry state. SPS is presently promoted by the development of novel torch concepts with axial feedstock injection. An example for a columnar structured double layer thermal barrier coating is given. Finally, Plasma Spray-Physical Vapor Deposition (PS-PVD) is a novel technology operating in controlled atmosphere at low pressure and high plasma power. At such condition, vaporization even of high-melting oxide ceramics is possible enabling the formation of columnar structured, strain tolerant coatings with low thermal conductivity. Applying different conditions, the deposition is still dominated by liquid splats. Such process is termed Low Pressure Plasma Spraying-Thin Film (LPPS-TF). Two examples of applications are gas-tight and highly ionic and electronic conductive electrolyte and membrane layers which were deposited on porous metallic substrates.

Surface treatment of ceramic articles

DOEpatents

Komvopoulos, K.; Brown, I.G.; Wei, B.; Anders, S.; Anders, A.; Bhatia, C.S.

1998-12-22

A process is disclosed for producing an article with improved ceramic surface properties including providing an article having a ceramic surface, and placing the article onto a conductive substrate holder in a hermetic enclosure. Thereafter a low pressure ambient is provided in the hermetic enclosure. A plasma including ions of solid materials is produced the ceramic surface of the article being at least partially immersed in a macroparticle free region of the plasma. While the article is immersed in the macroparticle free region, a bias of the substrate holder is biased between a low voltage at which material from the plasma condenses on the surface of the article and a high negative voltage at which ions from the plasma are implanted into the article. 15 figs.

Rapid sintering of anisotropic, nanograined Nd-Fe-B by flash-spark plasma sintering

NASA Astrophysics Data System (ADS)

Castle, Elinor; Sheridan, Richard; Grasso, Salvatore; Walton, Allan; Reece, Mike

2016-11-01

A Spark Plasma Sintering (SPS) furnace was used to Flash-Sinter (FS) Nd-Fe-Dy-Co-B-Ga melt spun permanent magnetic material. During the 10 s "Flash" process (heating rate 2660 K min-1), sample sintering (to theoretical density) and deformation (54% height reduction) occurred. This produced texturing and significant magnetic anisotropy, comparable to conventional die-upset magnets; yet with much greater coercivities (>1600 kA m-1) due to the nanoscale characteristics of the plate-like sintered grains. These preliminary results suggest that Flash-SPS could provide a new processing route for the mass production of highly anisotropic, nanocrystalline magnetic materials with high coercivity.

Monte Carlo simulation of ion-material interactions in nuclear fusion devices

NASA Astrophysics Data System (ADS)

Nieto Perez, M.; Avalos-Zuñiga, R.; Ramos, G.

2017-06-01

One of the key aspects regarding the technological development of nuclear fusion reactors is the understanding of the interaction between high-energy ions coming from the confined plasma and the materials that the plasma-facing components are made of. Among the multiple issues important to plasma-wall interactions in fusion devices, physical erosion and composition changes induced by energetic particle bombardment are considered critical due to possible material flaking, changes to surface roughness, impurity transport and the alteration of physicochemical properties of the near surface region due to phenomena such as redeposition or implantation. A Monte Carlo code named MATILDA (Modeling of Atomic Transport in Layered Dynamic Arrays) has been developed over the years to study phenomena related to ion beam bombardment such as erosion rate, composition changes, interphase mixing and material redeposition, which are relevant issues to plasma-aided manufacturing of microelectronics, components on object exposed to intense solar wind, fusion reactor technology and other important industrial fields. In the present work, the code is applied to study three cases of plasma material interactions relevant to fusion devices in order to highlight the code's capabilities: (1) the Be redeposition process on the ITER divertor, (2) physical erosion enhancement in castellated surfaces and (3) damage to multilayer mirrors used on EUV diagnostics in fusion devices due to particle bombardment.

Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge

DOEpatents

Selwyn, Gary S.; Henins, Ivars; Park, Jaeyoung; Herrmann, Hans W.

2006-04-11

Apparatus for the processing of materials involving placing a material either placed between an radio-frequency electrode and a ground electrode, or which is itself one of the electrodes. This is done in atmospheric pressure conditions. The apparatus effectively etches or cleans substrates, such as silicon wafers, or provides cleaning of spools and drums, and uses a gas containing an inert gas and a chemically reactive gas.

The Development of a Ti-6Al-4V Alloy via Oxygen Solid Solution Strengthening for Aerospace and Defense Applications

DTIC Science & Technology

2013-03-01

latter strategy. Mixtures of titanium powders and TiO2 particles were employed as starting materials and consolidated by spark - plasma sintering and...were consolidated in a carbon container installed in the spark - plasma sintering (SPS) equipment under vacuum condition (ɞ Pa) at a temperature of...evaluation of tensile properties of the wrought pure titanium materials consolidated by sintering and hot extrusion process, a theoretical approach using

Plasma Decontamination: A Case Study on Kill Efficacy of Geobacillus stearothermophilus Spores on Different Carrier Materials.

PubMed

Semmler, Egmont; Novak, Wenzel; Allinson, Wilf; Wallis, Darren; Wood, Nigel; Awakowicz, Peter; Wunderlich, Joachim

2016-01-01

A new technology to the pharmaceutical field is presented: surface decontamination by plasmas The technology is comparable to established barrier systems like e-beam, volatile hydrogen peroxide, or radiation inactivation of microbiological contaminations. This plasma technology is part of a fully automated and validated syringe filling line at a major pharmaceutical company and is in production operation. Incoming pre-sterilized syringe containers ("tubs") are processed by plasma, solely on the outside, and passed into the aseptic filling isolator upon successful decontamination. The objective of this article is to present the operating principles and develop and establish a validation routine on the basis of standard commercial biological indicators. Their decontamination efficacies are determined and correlated to the actual inactivation efficacy on the pharmaceutical packaging material.The reference setup is explained in detail and a short presentation of the cycle development and the relevant plasma control parameters is given, with a special focus on the in-process monitor determining the cycle validity. Different microbial inactivation mechanisms are also discussed and evaluated for their contribution and interaction to enhance plasma decontamination. A material-dependent inactivation behavior was observed. In order to be able to correlate the tub surface inactivation of Geobacillus stearothermophilus endospores to metallic biological indicators, a comparative study was performed. Through consistently demonstrating the linear inactivation behavior between the different materials, it becomes possible to develop an effective and time-saving validation scheme. The challenge in new decontamination systems lies in a thorough validation of the inactivation efficacy under different operating regimes. With plasma, as an ionized gas, a new barrier concept is introduced into pharmaceutical aseptic processing of syringes. The presented system operates in vacuum and only decontaminates the outer surface of pre-sterilized syringe containers ("tubs"), before they are transferred into the aseptic area. The plasma does not penetrate into the tub. This article discusses the phase from development and test germ selection, across the identified sporicidal mechanisms, to a proposal for a validation scheme on the basis of commercially available biological indicators. A special focus is placed on an extensive investigation to establish a link between the tub surface microbial kill (polystyrene and Tyvek(and (2)) ) and biological indicator inactivation (stainless steel). Additionally, a rationale is developed on how an optical in-process monitor can be applied to establish a validatable limit on the base of the predetermined inactivation data of Geobacillus stearothermophilus endospores. © PDA, Inc. 2016.

Stable aqueous dispersions of functionalized multi-layer graphene by pulsed underwater plasma exfoliation of graphite

NASA Astrophysics Data System (ADS)

Meyer-Plath, Asmus; Beckert, Fabian; Tölle, Folke J.; Sturm, Heinz; Mülhaupt, Rolf

2016-02-01

A process was developed for graphite particle exfoliation in water to stably dispersed multi-layer graphene. It uses electrohydraulic shockwaves and the functionalizing effect of solution plasma discharges in water. The discharges were excited by 100 ns high voltage pulsing of graphite particle chains that bridge an electrode gap. The underwater discharges allow simultaneous exfoliation and chemical functionalization of graphite particles to partially oxidized multi-layer graphene. Exfoliation is caused by shockwaves that result from rapid evaporation of carbon and water to plasma-excited gas species. Depending on discharge energy and locus of ignition, the shockwaves cause stirring, erosion, exfoliation and/or expansion of graphite flakes. The process was optimized to produce long-term stable aqueous dispersions of multi-layer graphene from graphite in a single process step without requiring addition of intercalants, surfactants, binders or special solvents. A setup was developed that allows continuous production of aqueous dispersions of flake size-selected multi-layer graphenes. Due to the well-preserved sp2-carbon structure, thin films made from the dispersed graphene exhibited high electrical conductivity. Underwater plasma discharge processing exhibits high innovation potential for morphological and chemical modifications of carbonaceous materials and surfaces, especially for the generation of stable dispersions of two-dimensional, layered materials.

PREFACE: 4th International Workshop & Summer School on Plasma Physics 2010

NASA Astrophysics Data System (ADS)

2014-06-01

Fourth International Workshop & Summer School on Plasma Physics 2010 The Fourth International Workshop & Summer School on Plasma Physics (IWSSPP'10) is organized by St. Kliment Ohridsky University of Sofia, with co-organizers TCPA Foundation, Association EURATOM/IRNRE, The Union of the Physicists in Bulgaria, and the Bulgarian Academy of Sciences. It was held in Kiten, Bulgaria, at the Black Sea Coast, from July 5 to July 10, 2010. The scientific programme covers the topics Fusion Plasma and Materials; Plasma Modeling and Fundamentals; Plasma Sources, Diagnostics and Technology. As the previous issues of this scientific meeting (IWSSPP'05, J. Phys.: Conf. Series 44 (2006) and IWSSPP'06, J. Phys.: Conf. Series 63 (2007), IWSSPP'08, J. Phys.: Conf. Series 207 (2010), its aim was to stimulate the creation and support of a new generation of young scientists for further development of plasma physics fundamentals and applications, as well as to ensure an interdisciplinary exchange of views and initiate possible collaborations by bringing together scientists from various branches of plasma physics. This volume of Journal of Physics: Conference Series includes 34 papers (invited lectures, contributed talks and posters) devoted to various branches of plasma physics, among them fusion plasma and materials, dc and microwave discharge modelling, transport phenomena in gas discharge plasmas, plasma diagnostics, cross sections and rate constants of elementary processes, material processing, plasma-chemistry and technology. Some of them have been presented by internationally known and recognized specialists in their fields; others are MSc or PhD students' first steps in science. In both cases, we believe they will raise readers' interest. We would like to thank the members of both the International Advisory Committee and the Local Organizing Committee, the participants who sent their manuscripts and passed through the (sometimes heavy and troublesome) refereeing and editing procedure and our referees for their patience and considerable effort to improve the manuscripts. We would like to express our gratitude to the invited lecturers who were willing to pay the participation fee. In this way, in addition to the intellectual support they provided by means of their excellent lectures, they also supported the school financially. E. Benova

Method for the rapid synthesis of large quantities of metal oxide nanowires at low temperatures

DOEpatents

Sunkara, Mahendra Kumar [Louisville, KY; Vaddiraju, Sreeram [Mountain View, CA; Mozetic, Miran [Ljubljan, SI; Cvelbar, Uros [Idrija, SI

2009-09-22

A process for the rapid synthesis of metal oxide nanoparticles at low temperatures and methods which facilitate the fabrication of long metal oxide nanowires. The method is based on treatment of metals with oxygen plasma. Using oxygen plasma at low temperatures allows for rapid growth unlike other synthesis methods where nanomaterials take a long time to grow. Density of neutral oxygen atoms in plasma is a controlling factor for the yield of nanowires. The oxygen atom density window differs for different materials. By selecting the optimal oxygen atom density for various materials the yield can be maximized for nanowire synthesis of the metal.

Effect of plasma spraying modes on material properties of internal combustion engine cylinder liners

NASA Astrophysics Data System (ADS)

Timokhova, O. M.; Burmistrova, O. N.; Sirina, E. A.; Timokhov, R. S.

2018-03-01

The paper analyses different methods of remanufacturing worn-out machine parts in order to get the best performance characteristics. One of the most promising of them is a plasma spraying method. The mathematical models presented in the paper are intended to anticipate the results of plasma spraying, its effect on the properties of the material of internal combustion engine cylinder liners under repair. The experimental data and research results have been computer processed with Statistica 10.0 software package. The pare correlation coefficient values (R) and F-statistic criterion are given to confirm the statistical properties and adequacy of obtained regression equations.

Numerical modeling of materials processes with fluid-fluid interfaces

NASA Astrophysics Data System (ADS)

Yanke, Jeffrey Michael

A numerical model has been developed to study material processes that depend on the interaction between fluids with a large discontinuity in thermophysical properties. A base model capable of solving equations of mass, momentum, energy conservation, and solidification has been altered to enable tracking of the interface between two immiscible fluids and correctly predict the interface deformation using a volume of fluid (VOF) method. Two materials processes investigated using this technique are Electroslag Remelting (ESR) and plasma spray deposition. ESR is a secondary melting technique that passes an AC current through an electrically resistive slag to provide the heat necessary to melt the alloy. The simulation tracks the interface between the slag and metal. The model was validated against industrial scale ESR ingots and was able to predict trends in melt rate, sump depth, macrosegregation, and liquid sump depth. In order to better understand the underlying physics of the process, several constant current ESR runs simulated the effects of freezing slag in the model. Including the solidifying slag in the imulations was found to have an effect on the melt rate and sump shape but there is too much uncertainty in ESR slag property data at this time for quantitative predictions. The second process investigated in this work is the deposition of ceramic coatings via plasma spray deposition. In plasma spray deposition, powderized coating material is injected into a plasma that melts and carries the powder towards the substrate were it impacts, flattening out and freezing. The impacting droplets pile up to form a porous coating. The model is used to simulate this rain of liquid ceramic particles impacting the substrate and forming a coating. Trends in local solidification time and porosity are calculated for various particle sizes and velocities. The predictions of decreasing porosity with increasing particle velocity matches previous experimental results. Also, a preliminary study was conducted to investigate the effects of substrate surface defects and droplet impact angle on the propensity to form columnar porosity.

A comparative study of ethylene oxide gas, hydrogen peroxide gas plasma, and low-temperature steam formaldehyde sterilization.

PubMed

Kanemitsu, Keiji; Imasaka, Takayuki; Ishikawa, Shiho; Kunishima, Hiroyuki; Harigae, Hideo; Ueno, Kumi; Takemura, Hiromu; Hirayama, Yoshihiro; Kaku, Mitsuo

2005-05-01

To compare the efficacies of ethylene oxide gas (EOG), hydrogen peroxide gas plasma (PLASMA), and low-temperature steam formaldehyde (LTSF) sterilization methods. The efficacies of EOG, PLASMA, and LTSF sterilization were tested using metal and plastic plates, common medical instruments, and three process challenge devices with narrow lumens. All items were contaminated with Bacillus stearothermophilus spores or used a standard biological indicator. EOG and LTSF demonstrated effective killing of B. stearothermophilus spores, with or without serum, on plates, on instruments, and in process challenge devices. PLASMA failed to adequately sterilize materials on multiple trials in several experiments, including two of three plates, two of three instruments, and all process challenge devices. Our results suggest that PLASMA sterilization may be unsuccessful under certain conditions, particularly when used for items with complex shapes and narrow lumens. Alternatively, LTSF sterilization demonstrates excellent efficacy and is comparable to EOG sterilization. LTSF could potentially act as a substitute if EOG becomes unavailable due to environmental concerns.

Apparatus and method for oxidation and stabilization of polymeric materials

DOEpatents

Paulauskas, Felix L [Knoxville, TN; White, Terry L [Knoxville, TN; Sherman, Daniel M [Knoxville, TN

2009-05-19

An apparatus for treating polymeric materials comprises a treatment chamber adapted to maintain a selected atmosphere; a means for supporting the polymeric material within the chamber; and, a source of plasma-derived gas containing at least one reactive oxidative species whereby the polymer is stabilized and cross linked through exposure to the oxidative species in the chamber at a selected temperature. The polymer may be directly exposed to the plasma, or alternatively, the plasma may be established in a separate volume from which the reactive species may be extracted and introduced into the vicinity of the polymer. The apparatus may be configured for either batch-type or continuous-type processing. The apparatus and method are especially useful for preparing polymer fibers, particularly PAN fibers, for later carbonization treatments.

Apparatus and method for oxidation and stabilization of polymeric materials

DOEpatents

Paulauskas, Felix L [Knoxville, TN; White, Terry L [Knoxville, TN; Sherman, Daniel M [Knoxville, TN

2010-08-31

An apparatus for treating polymeric materials comprises a treatment chamber adapted to maintain a selected atmosphere; a means for supporting the polymeric material within the chamber; and, a source of plasma-derived gas containing at least one reactive oxidative species whereby the polymer is stabilized and cross linked through exposure to the oxidative species in the chamber at a selected temperature. The polymer may be directly exposed to the plasma, or alternatively, the plasma may be established in a separate volume from which the reactive species may be extracted and introduced into the vicinity of the polymer. The apparatus may be configured for either batch-type or continuous-type processing. The apparatus and method are especially useful for preparing polymer fibers, particularly PAN fibers, for later carbonization treatments.

Ablation study of tungsten-based nuclear thermal rocket fuel

NASA Astrophysics Data System (ADS)

Smith, Tabitha Elizabeth Rose

The research described in this thesis has been performed in order to support the materials research and development efforts of NASA Marshall Space Flight Center (MSFC), of Tungsten-based Nuclear Thermal Rocket (NTR) fuel. The NTR was developed to a point of flight readiness nearly six decades ago and has been undergoing gradual modification and upgrading since then. Due to the simplicity in design of the NTR, and also in the modernization of the materials fabrication processes of nuclear fuel since the 1960's, the fuel of the NTR has been upgraded continuously. Tungsten-based fuel is of great interest to the NTR community, seeking to determine its advantages over the Carbide-based fuel of the previous NTR programs. The materials development and fabrication process contains failure testing, which is currently being conducted at MSFC in the form of heating the material externally and internally to replicate operation within the nuclear reactor of the NTR, such as with hot gas and RF coils. In order to expand on these efforts, experiments and computational studies of Tungsten and a Tungsten Zirconium Oxide sample provided by NASA have been conducted for this dissertation within a plasma arc-jet, meant to induce ablation on the material. Mathematical analysis was also conducted, for purposes of verifying experiments and making predictions. The computational method utilizes Anisimov's kinetic method of plasma ablation, including a thermal conduction parameter from the Chapman Enskog expansion of the Maxwell Boltzmann equations, and has been modified to include a tangential velocity component. Experimental data matches that of the computational data, in which plasma ablation at an angle shows nearly half the ablation of plasma ablation at no angle. Fuel failure analysis of two NASA samples post-testing was conducted, and suggestions have been made for future materials fabrication processes. These studies, including the computational kinetic model at an angle and the ablation of the NASA sample, could be applied to an atmospheric reentry body, reentering at a ballistic trajectory at hypersonic velocities.

Large-Area Permanent-Magnet ECR Plasma Source

NASA Technical Reports Server (NTRS)

Foster, John E.

2007-01-01

A 40-cm-diameter plasma device has been developed as a source of ions for material-processing and ion-thruster applications. Like the device described in the immediately preceding article, this device utilizes electron cyclotron resonance (ECR) excited by microwave power in a magnetic field to generate a plasma in an electrodeless (noncontact) manner and without need for an electrically insulating, microwave-transmissive window at the source. Hence, this device offers the same advantages of electrodeless, windowless design - low contamination and long operational life. The device generates a uniform, high-density plasma capable of sustaining uniform ion-current densities at its exit plane while operating at low pressure [<10(exp -4) torr (less than about 1.3 10(exp -2) Pa)] and input power <200 W at a frequency of 2.45 GHz. Though the prototype model operates at 2.45 GHz, operation at higher frequencies can be achieved by straightforward modification to the input microwave waveguide. Higher frequency operation may be desirable in those applications that require even higher background plasma densities. In the design of this ECR plasma source, there are no cumbersome, power-hungry electromagnets. The magnetic field in this device is generated by a permanent-magnet circuit that is optimized to generate resonance surfaces. The microwave power is injected on the centerline of the device. The resulting discharge plasma jumps into a "high mode" when the input power rises above 150 W. This mode is associated with elevated plasma density and high uniformity. The large area and uniformity of the plasma and the low operating pressure are well suited for such material-processing applications as etching and deposition on large silicon wafers. The high exit-plane ion-current density makes it possible to attain a high rate of etching or deposition. The plasma potential is <3 V low enough that there is little likelihood of sputtering, which, in plasma processing, is undesired because it is associated with erosion and contamination. The electron temperature is low and does not vary appreciably with power.

Plasma Diagnostics: Use and Justification in an Industrial Environment

NASA Astrophysics Data System (ADS)

Loewenhardt, Peter

1998-10-01

The usefulness and importance of plasma diagnostics have played a major role in the development of plasma processing tools in the semiconductor industry. As can be seen through marketing materials from semiconductor equipment manufacturers, results from plasma diagnostic equipment can be a powerful tool in selling the technological leadership of tool design. Some diagnostics have long been used for simple process control such as optical emission for endpoint determination, but in recent years more sophisticated and involved diagnostic tools have been utilized in chamber and plasma source development and optimization. It is now common to find an assortment of tools at semiconductor equipment companies such as Langmuir probes, mass spectrometers, spatial optical emission probes, impedance, ion energy and ion flux probes. An outline of how the importance of plasma diagnostics has grown at an equipment manufacturer over the last decade will be given, with examples of significant and useful results obtained. Examples will include the development and optimization of an inductive plasma source, trends and hardware effects on ion energy distributions, mass spectrometry influences on process development and investigations of plasma-wall interactions. Plasma diagnostic focus, in-house development and proliferation in an environment where financial justification requirements are both strong and necessary will be discussed.

Advanced plasma etch technologies for nanopatterning

NASA Astrophysics Data System (ADS)

Wise, Rich

2013-10-01

Advances in patterning techniques have enabled the extension of immersion lithography from 65/45 nm through 14/10 nm device technologies. A key to this increase in patterning capability has been innovation in the subsequent dry plasma etch processing steps. Multiple exposure techniques, such as litho-etch-litho-etch, sidewall image transfer, line/cut mask, and self-aligned structures, have been implemented to solution required device scaling. Advances in dry plasma etch process control across wafer uniformity and etch selectivity to both masking materials have enabled adoption of vertical devices and thin film scaling for increased device performance at a given pitch. Plasma etch processes, such as trilayer etches, aggressive critical dimension shrink techniques, and the extension of resist trim processes, have increased the attainable device dimensions at a given imaging capability. Precise control of the plasma etch parameters affecting across-design variation, defectivity, profile stability within wafer, within lot, and across tools has been successfully implemented to provide manufacturable patterning technology solutions. IBM has addressed these patterning challenges through an integrated total patterning solutions team to provide seamless and synergistic patterning processes to device and integration internal customers. We will discuss these challenges and the innovative plasma etch solutions pioneered by IBM and our alliance partners.

Advanced plasma etch technologies for nanopatterning

NASA Astrophysics Data System (ADS)

Wise, Rich

2012-03-01

Advances in patterning techniques have enabled the extension of immersion lithography from 65/45nm through 14/10nm device technologies. A key to this increase in patterning capability has been innovation in the subsequent dry plasma etch processing steps. Multiple exposure techniques such as litho-etch-litho-etch, sidewall image transfer, line/cut mask and self-aligned structures have been implemented to solution required device scaling. Advances in dry plasma etch process control, across wafer uniformity and etch selectivity to both masking materials and have enabled adoption of vertical devices and thin film scaling for increased device performance at a given pitch. Plasma etch processes such as trilayer etches, aggressive CD shrink techniques, and the extension of resist trim processes have increased the attainable device dimensions at a given imaging capability. Precise control of the plasma etch parameters affecting across design variation, defectivity, profile stability within wafer, within lot, and across tools have been successfully implemented to provide manufacturable patterning technology solutions. IBM has addressed these patterning challenges through an integrated Total Patterning Solutions team to provide seamless and synergistic patterning processes to device and integration internal customers. This paper will discuss these challenges and the innovative plasma etch solutions pioneered by IBM and our alliance partners.

A process to fabricate fused silica nanofluidic devices with embedded electrodes using an optimized room temperature bonding technique

NASA Astrophysics Data System (ADS)

Boden, Seth; Karam, P.; Schmidt, A.; Pennathur, S.

2017-05-01

Fused silica is an ideal material for nanofluidic systems due to its extreme purity, chemical inertness, optical transparency, and native hydrophilicity. However, devices requiring embedded electrodes (e.g., for bioanalytical applications) are difficult to realize given the typical high temperature fusion bonding requirements (˜1000 °C). In this work, we optimize a two-step plasma activation process which involves an oxygen plasma treatment followed by a nitrogen plasma treatment to increase the fusion bonding strength of fused silica at room temperature. We conduct a parametric study of this treatment to investigate its effect on bonding strength, surface roughness, and microstructure morphology. We find that by including a nitrogen plasma treatment to the standard oxygen plasma activation process, the room temperature bonding strength increases by 70% (0.342 J/m2 to 0.578 J/m2). Employing this optimized process, we fabricate and characterize a nanofluidic device with an integrated and dielectrically separated electrode. Our results prove that the channels do not leak with over 1 MPa of applied pressure after a 24 h storage time, and the electrode exhibits capacitive behavior with a finite parallel resistance in the upper MΩ range for up to a 6.3Vdc bias. These data thus allow us to overcome the barrier that has barred nanofluidic progress for the last decade, namely, the development of nanometer scale well-defined channels with embedded metallic materials for far-reaching applications such as the exquisite manipulation of biomolecules.

Fluid Mechanics and Heat Transfer of Liquid Precursor Droplets Injected into High-Temperature Plasmas

NASA Astrophysics Data System (ADS)

Basu, Saptarshi; Jordan, Eric H.; Cetegen, Baki M.

2008-03-01

Thermo-physical processes in liquid ceramic precursor droplets in plasma were modeled. Models include aerodynamic droplet break-up, droplet transport, as well as heat and mass transfer within individual droplets. Droplet size, solute concentration, and plasma temperature effects are studied. Results are discussed with the perspective of selecting processing conditions and injection parameters to obtain certain types of coating microstructures. Small droplets (<5 microns) are found to undergo volumetric precipitation and coating deposition with small unpyrolized material. Droplets can be made to undergo shear break-up by reducing surface tension and small droplets promote volumetric precipitation. Small particles reach substrate as molten splats resulting in denser coatings. Model predicts that larger droplets (>5 microns) tend to surface precipitate-forming shells with liquid core. They may be subjected to internal pressurization leading to shattering of shells and secondary atomization of liquid within. They arrive at the substrate as broken shells and unpyrolized material.

Benchmarking sheath subgrid boundary conditions for macroscopic-scale simulations

NASA Astrophysics Data System (ADS)

Jenkins, T. G.; Smithe, D. N.

2015-02-01

The formation of sheaths near metallic or dielectric-coated wall materials in contact with a plasma is ubiquitous, often giving rise to physical phenomena (sputtering, secondary electron emission, etc) which influence plasma properties and dynamics both near and far from the material interface. In this paper, we use first-principles PIC simulations of such interfaces to formulate a subgrid sheath boundary condition which encapsulates fundamental aspects of the sheath behavior at the interface. Such a boundary condition, based on the capacitive behavior of the sheath, is shown to be useful in fluid simulations wherein sheath scale lengths are substantially smaller than scale lengths for other relevant physical processes (e.g. radiofrequency wavelengths), in that it enables kinetic processes associated with the presence of the sheath to be numerically modeled without explicit resolution of spatial and temporal sheath scales such as electron Debye length or plasma frequency.

Spectroscopic and antimicrobial studies of polystyrene films under air plasma and He-Ne laser treatment

NASA Astrophysics Data System (ADS)

Pawde, S. M.; Parab, Sanmesh S.

2008-05-01

Polystyrene (PS) films are used in packaging and biomedical applications because of their transparency and good environmental properties. The present investigation is centered on the antifungal and antibacterial activities involved in the film surface. Subsequently, microbial formations were immobilized on the modified PS films. Living microorganisms such as bacteria and yeast were used. Untreated PS films show very fast rate of growth of bacteria within few hours. The study involves developments of polymer surfaces with bacterial growth and further studies after giving antibacterial treatment such as plasma treatment. Major emphasis has been given to study the effect of various parameters which can affect the performance of the improved material. Films were prepared by two methods: plasma treatment under vacuum and under ongoing He-Ne laser source. The parameters such as (1) surface area by contact angle measurements, (2) quality of material before and after treatment by SEM and FTIR spectra and (3) material characterization by UV-vis spectra were studied. It was observed that plasma treatment of the PS material for different processing time improved the surface properties of PS films.

Vacuum plasma spray applications on liquid fuel rocket engines

NASA Technical Reports Server (NTRS)

Mckechnie, T. N.; Zimmerman, F. R.; Bryant, M. A.

1992-01-01

The vacuum plasma spray process (VPS) has been developed by NASA and Rocketdyne for a variety of applications on liquid fuel rocket engines, including the Space Shuttle Main Engine. These applications encompass thermal barrier coatings which are thermal shock resistant for turbopump blades and nozzles; bond coatings for cryogenic titanium components; wear resistant coatings and materials; high conductivity copper, NaRloy-Z, combustion chamber liners, and structural nickel base material, Inconel 718, for nozzle and combustion chamber support jackets.

High T(sub c) superconductors fabricated by plasma aerosol mist deposition technique

NASA Technical Reports Server (NTRS)

Wang, X. W.; Vuong, K. D.; Leone, A.; Shen, C. Q.; Williams, J.; Coy, M.

1995-01-01

We report new results on high T(sub c) superconductors fabricated by a plasma aerosol mist deposition technique, in atmospheric environment. Materials fabricated are YBaCuO, BiPbSrCaCuO, BaCaCuO precursor films for TlBaCaCuO, and other buffers such as YSZ. Depending on processing conditions, sizes of crystallites and/or particles are between dozens of nano-meters and several micrometers. Superconductive properties and other material characteristics can also be tailored.

High heat flux testing of CFC composites for the tokamak physics experiment

NASA Astrophysics Data System (ADS)

Valentine, P. G.; Nygren, R. E.; Burns, R. W.; Rocket, P. D.; Colleraine, A. P.; Lederich, R. J.; Bradley, J. T.

1996-10-01

High heat flux (HHF) testing of carbon fiber reinforced carbon composites (CFC's) was conducted under the General Atomics program to develop plasma-facing components (PFC's) for Princeton Plasma Physics Laboratory's tokamak physics experiment (TPX). As part of the process of selecting TPX CFC materials, a series of HHF tests were conducted with the 30 kW electron beam test system (EBTS) facility at Sandia National Laboratories, and with the plasma disruption simulator I (PLADIS-I) facility at the University of New Mexico. The purpose of the tests was to make assessments of the thermal performance and erosion behavior of CFC materials. Tests were conducted with 42 different CFC materials. In general, the CFC materials withstood the rapid thermal pulse environments without fracturing, delaminating, or degrading in a non-uniform manner; significant differences in thermal performance, erosion behavior, vapor evolution, etc. were observed and preliminary findings are presented below. The CFC's exposed to the hydrogen plasma pulses in PLADIS-I exhibited greater erosion rates than the CFC materials exposed to the electron-beam pulses in EBTS. The results obtained support the continued consideration of a variety of CFC composites for TPX PFC components.

Laser machining of explosives

DOEpatents

Perry, Michael D.; Stuart, Brent C.; Banks, Paul S.; Myers, Booth R.; Sefcik, Joseph A.

2000-01-01

The invention consists of a method for machining (cutting, drilling, sculpting) of explosives (e.g., TNT, TATB, PETN, RDX, etc.). By using pulses of a duration in the range of 5 femtoseconds to 50 picoseconds, extremely precise and rapid machining can be achieved with essentially no heat or shock affected zone. In this method, material is removed by a nonthermal mechanism. A combination of multiphoton and collisional ionization creates a critical density plasma in a time scale much shorter than electron kinetic energy is transferred to the lattice. The resulting plasma is far from thermal equilibrium. The material is in essence converted from its initial solid-state directly into a fully ionized plasma on a time scale too short for thermal equilibrium to be established with the lattice. As a result, there is negligible heat conduction beyond the region removed resulting in negligible thermal stress or shock to the material beyond a few microns from the laser machined surface. Hydrodynamic expansion of the plasma eliminates the need for any ancillary techniques to remove material and produces extremely high quality machined surfaces. There is no detonation or deflagration of the explosive in the process and the material which is removed is rendered inert.

PREFACE: 2nd International Meeting for Researchers in Materials and Plasma Technology

NASA Astrophysics Data System (ADS)

Niño, Ely Dannier V.

2013-11-01

These proceedings present the written contributions of the participants of the 2nd International Meeting for Researchers in Materials and Plasma Technology, 2nd IMRMPT, which was held from February 27 to March 2, 2013 at the Pontificia Bolivariana Bucaramanga-UPB and Santander and Industrial - UIS Universities, Bucaramanga, Colombia, organized by research groups from GINTEP-UPB, FITEK-UIS. The IMRMPT, was the second version of biennial meetings that began in 2011. The three-day scientific program of the 2nd IMRMPT consisted in 14 Magisterial Conferences, 42 Oral Presentations and 48 Poster Presentations, with the participation of undergraduate and graduate students, professors, researchers and entrepreneurs from Colombia, Russia, France, Venezuela, Brazil, Uruguay, Argentina, Peru, Mexico, United States, among others. Moreover, the objective of IMRMPT was to bring together national and international researchers in order to establish scientific cooperation in the field of materials science and plasma technology; introduce new techniques of surface treatment of materials to improve properties of metals in terms of the deterioration due to corrosion, hydrogen embrittlement, abrasion, hardness, among others; and establish cooperation agreements between universities and industry. The topics covered in the 2nd IMRMPT include New Materials, Surface Physics, Laser and Hybrid Processes, Characterization of Materials, Thin Films and Nanomaterials, Surface Hardening Processes, Wear and Corrosion / Oxidation, Modeling, Simulation and Diagnostics, Plasma Applications and Technologies, Biomedical Coatings and Surface Treatments, Non Destructive Evaluation and Online Process Control, Surface Modification (Ion Implantation, Ion Nitriding, PVD, CVD). The editors hope that those interested in the are of materials science and plasma technology, enjoy the reading that reflect a wide range of topics. It is a pleasure to thank the sponsors and all the participants and contributors for making possible this international meeting of researchers. It should be noted that the event organized by UIS and UPB universities, through their research groups FITEK and GINTEP, was a very significant contribution to the national and international scientific community, achieving the interaction of different research groups from academia and business sector. On behalf of the research groups GINTEP - UPB and FITEK - UIS, we greatly appreciate the support provided by the Sponsors, who allowed to continue with the dream of research. Ely Dannier V-Nitilde no The Editor The PDF file also contains a list of committees and sponsors.

[Fundamentals of plasma chemistry and its application to drug engineering].

PubMed

Kuzuya, M

1996-04-01

In this review, our novel research works in both low temperature plasma chemistry and solid state plasma chemistry were described. As for low temperature plasma, the ESR study on plasma-induced radicals of several selected conventional polymers was shown including the detailed analyses of the radical structure and the mechanism by which the radicals were formed on typical degradable methacrylic polymers and cross-linkable polystyrene. One of the pharmaceutical applications of the plasma processing for drug delivery system (DDS) was also described, which includes the preparations of double-compressed tablet consisting of drugs as a core material and various types of polymers as a wall material followed by plasma-irradiation on such a tablet. As for solid state plasma, the detailed reaction mechanism of solid state mechanochemical polymerization was shown including the solid state single electron transfer and the special feature of the resulting polymers. The structural criteria for polymerizable monomer derived from the quantum chemical considerations were also established. Based on the above findings, we synthesized various polymeric prodrugs by mechanochemical polymerization and studied the nature of hydrolyses (drug release).

Time-dependent areal mass density for disc-shaped substrates in a corona-activated flow stream at atmospheric pressure for argon/acetylene admixture

NASA Astrophysics Data System (ADS)

Xie, Shuzheng; Islam, Rokibul; Hussein, Bashir; Englund, Karl; Pedrow, Patrick

2015-09-01

In this research we use a 40-needle array energized with 60 Hz AC voltage in the range 5 to 15 kV RMS. Plasma processing takes place downstream from a grounded planar screen (the opposing electrode). The needle-to-screen gap is in the range 4 to 10 cm and its E-field generates weakly ionized plasma via streamers and back corona. Deposited material is plasma-polymerized acetylene. Substrates are potassium bromide, mica, wood, paper, and gold-covered solids. Substrate chemical species influence the efficiency with which the disc amasses plasma-polymerized material, at least until the substrate is fully covered with film. Early plasma-polymerization is accompanied by nucleation-site-dominated nodules but longer term deposition results in a film that fully covers the substrate. We will report on time-dependent areal mass density associated with run times in the range 5-60 minutes. Film thickness will be measured using instruments that include visible light microscopy, TEM, and SEM. Others in our research group are studying areal mass density for early times (1-5 minutes) when nodule growth (at nucleation sites) dominates the deposition process.

The investigation of order–disorder transition process of ZSM-5 induced by spark plasma sintering

DOE Office of Scientific and Technical Information (OSTI.GOV)

Wang, Liang; Wang, Lianjun, E-mail: wanglj@dhu.edu.cn; Jiang, Wan

2014-04-01

Based on the amorphization of zeolites, an order–disorder transition method was used to prepare silica glass via Spark Plasma Sintering (SPS). In order to get a better understanding about the mechanism of amorphization induced by SPS, the intermediate products in this process were prepared and characterized by different characterization techniques. X-ray diffraction and High-energy synchrotron X-ray scattering show a gradual transformation from ordered crystal to glass. Local structural changes in glass network including Si–O bond length, O–Si–O bond angle, size of rings, coordination were detected by Infrared spectroscopy and {sup 29}Si magic-angle spinning nuclear magnetic resonance (NMR) spectroscopy. Topologically ordered,more » amorphous material with a different intermediate-range structure can be obtained by precise control of intermediate process which can be expected to optimize and design material. - Graphical abstract: Low-density, ordered zeolites collapse to the rigid amorphous glass through spark plasma sintering. The intermediate-range structure formed in the process of order–disorder transition may give rise to specific property. - Highlights: • Order–disorder transition process of ZSM-5 induced by spark plasma sintering was investigated using several methods including XRD, High-energy synchrotron X-ray scattering, SAXS, IR, NMR, ect. • Order–disorder transition induced by SPS was compared with TIA and PIA. • Three stages has been divided during the whole process. • The collapse temperature range which may give rise to intermediate-range structure has been located.« less

Analytical Modeling of Plasma Arc Cutting of Steel Plate

NASA Astrophysics Data System (ADS)

Cimbala, John; Fisher, Lance; Settles, Gary; Lillis, Milan

2000-11-01

A transferred-arc plasma torch cuts steel plate, and in the process ejects a molten stream of iron and ferrous oxides ("ejecta"). Under non-optimum conditions - especially during low speed cuts and/or small-radius corner cuts - "dross" is formed. Dross is re-solidified molten metal that sticks to the underside of the cut and renders it rough. The present research is an attempt to analytically model this process, with the goal of predicting dross formation. With the aid of experimental data, a control volume formulation is used in a steady frame of reference to predict the mass flow of molten material inside the cut. Although simple, the model is three-dimensional, can predict the shear stress driving the molten material in the direction of the plasma jet, and can predict the velocity of molten material exiting the bottom of the plate. In order to predict formation of dross, a momentum balance is performed on the flowing melt, considering the resisting viscous and surface tension forces. Preliminary results are promising, and provide a potential means of predicting dross formation without resorting to detailed computational analyses.

Suboxide/subnitride formation on Ta masks during magnetic material etching by reactive plasmas

DOE Office of Scientific and Technical Information (OSTI.GOV)

Li, Hu; Muraki, Yu; Karahashi, Kazuhiro

2015-07-15

Etching characteristics of tantalum (Ta) masks used in magnetoresistive random-access memory etching processes by carbon monoxide and ammonium (CO/NH{sub 3}) or methanol (CH{sub 3}OH) plasmas have been examined by mass-selected ion beam experiments with in-situ surface analyses. It has been suggested in earlier studies that etching of magnetic materials, i.e., Fe, Ni, Co, and their alloys, by such plasmas is mostly due to physical sputtering and etch selectivity of the process arises from etch resistance (i.e., low-sputtering yield) of the hard mask materials such as Ta. In this study, it is shown that, during Ta etching by energetic CO{sup +}more » or N{sup +} ions, suboxides or subnitrides are formed on the Ta surface, which reduces the apparent sputtering yield of Ta. It is also shown that the sputtering yield of Ta by energetic CO{sup +} or N{sup +} ions has a strong dependence on the angle of ion incidence, which suggests a correlation between the sputtering yield and the oxidation states of Ta in the suboxide or subnitride; the higher the oxidation state of Ta, the lower is the sputtering yield. These data account for the observed etch selectivity by CO/NH{sub 3} and CH{sub 3}OH plasmas.« less

Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber

NASA Astrophysics Data System (ADS)

Dechana, A.; Thamboon, P.; Boonyawan, D.

2014-10-01

A microwave remote Plasma Enhanced-Atomic Layer Deposition system with multicusp confinement chamber is established at the Plasma and Beam Physics research facilities, Chiang Mai, Thailand. The system produces highly-reactive plasma species in order to enhance the deposition process of thin films. The addition of the multicusp magnetic fields further improves the plasma density and uniformity in the reaction chamber. Thus, the system is more favorable to temperature-sensitive substrates when heating becomes unwanted. Furthermore, the remote-plasma feature, which is generated via microwave power source, offers tunability of the plasma properties separately from the process. As a result, the system provides high flexibility in choice of materials and design experiments, particularly for low-temperature applications. Performance evaluations of the system were carried on coating experiments of Al2O3 layers onto a silicon wafer. The plasma characteristics in the chamber will be described. The resulted Al2O3 films—analyzed by Rutherford Backscattering Spectrometry in channeling mode and by X-ray Photoelectron Spectroscopy techniques—will be discussed.

Microwave remote plasma enhanced-atomic layer deposition system with multicusp confinement chamber.

PubMed

Dechana, A; Thamboon, P; Boonyawan, D

2014-10-01

A microwave remote Plasma Enhanced-Atomic Layer Deposition system with multicusp confinement chamber is established at the Plasma and Beam Physics research facilities, Chiang Mai, Thailand. The system produces highly-reactive plasma species in order to enhance the deposition process of thin films. The addition of the multicusp magnetic fields further improves the plasma density and uniformity in the reaction chamber. Thus, the system is more favorable to temperature-sensitive substrates when heating becomes unwanted. Furthermore, the remote-plasma feature, which is generated via microwave power source, offers tunability of the plasma properties separately from the process. As a result, the system provides high flexibility in choice of materials and design experiments, particularly for low-temperature applications. Performance evaluations of the system were carried on coating experiments of Al2O3 layers onto a silicon wafer. The plasma characteristics in the chamber will be described. The resulted Al2O3 films-analyzed by Rutherford Backscattering Spectrometry in channeling mode and by X-ray Photoelectron Spectroscopy techniques-will be discussed.

Preface

NASA Astrophysics Data System (ADS)

Bonse, Jörn; Zergioti, Ioanna; Delaporte, Philippe; Scarisoreanu, Nicu Doinel

2016-06-01

This special issue represents the proceedings of the Symposium CC "Laser and plasma processing for advanced applications in material science" held from May 11th to 15th 2015 in the Lille Grand Palais, France, during the annual Spring Meeting of the European Materials Research Society (E-MRS).

Review: engineering particles using the aerosol-through-plasma method

DOE Office of Scientific and Technical Information (OSTI.GOV)

Phillips, Jonathan; Luhrs, Claudia C; Richard, Monique

2009-01-01

For decades, plasma processing of materials on the nanoscale has been an underlying enabling technology for many 'planar' technologies, particularly virtually every aspect of modern electronics from integrated-circuit fabrication with nanoscale elements to the newest generation of photovoltaics. However, it is only recent developments that suggest that plasma processing can be used to make 'particulate' structures of value in fields, including catalysis, drug delivery, imaging, higher energy density batteries, and other forms of energy storage. In this paper, the development of the science and technology of one class of plasma production of particulates, namely, aerosol-through-plasma (A-T-P), is reviewed. Various plasmamore » systems, particularly RF and microwave, have been used to create nanoparticles of metals and ceramics, as well as supported metal catalysts. Gradually, the complexity of the nanoparticles, and concomitantly their potential value, has increased. First, unique two-layer particles were generated. These were postprocessed to create unique three-layer nanoscale particles. Also, the technique has been successfully employed to make other high-value materials, including carbon nanotubes, unsupported graphene, and spherical boron nitride. Some interesting plasma science has also emerged from efforts to characterize and map aerosol-containing plasmas. For example, it is clear that even a very low concentration of particles dramatically changes plasma characteristics. Some have also argued that the local-thermodynamic-equilibrium approach is inappropriate to these systems. Instead, it has been suggested that charged- and neutral-species models must be independently developed and allowed to 'interact' only in generation terms.« less

Non-thermal plasma conversion of hydrocarbons

DOE Office of Scientific and Technical Information (OSTI.GOV)

Strohm, James J.; Skoptsov, George L.; Musselman, Evan T.

A non-thermal plasma is generated to selectively convert a precursor to a product. More specifically, plasma forming material and a precursor material are provided to a reaction zone of a vessel. The reaction zone is exposed to microwave radiation, including exposing the plasma forming material and the precursor material to the microwave radiation. The exposure of the plasma forming material to the microwave radiation selectively converts the plasma forming material to a non-thermal plasma including formation of one or more streamers. The precursor material is mixed with the plasma forming material and the precursor material is exposed to the non-thermalmore » plasma including exposing the precursor material to the one or more streamers. The exposure of the precursor material to the streamers and the microwave radiation selectively converts the precursor material to a product.« less

High density plasma etching of magnetic devices

NASA Astrophysics Data System (ADS)

Jung, Kee Bum

Magnetic materials such as NiFe (permalloy) or NiFeCo are widely used in the data storage industry. Techniques for submicron patterning are required to develop next generation magnetic devices. The relative chemical inertness of most magnetic materials means they are hard to etch using conventional RIE (Reactive Ion Etching). Therefore ion milling has generally been used across the industry, but this has limitations for magnetic structures with submicron dimensions. In this dissertation, we suggest high density plasmas such as ECR (Electron Cyclotron Resonance) and ICP (Inductively Coupled Plasma) for the etching of magnetic materials (NiFe, NiFeCo, CoFeB, CoSm, CoZr) and other related materials (TaN, CrSi, FeMn), which are employed for magnetic devices like magnetoresistive random access memories (MRAM), magnetic read/write heads, magnetic sensors and microactuators. This research examined the fundamental etch mechanisms occurring in high density plasma processing of magnetic materials by measuring etch rate, surface morphology and surface stoichiometry. However, one concern with using Cl2-based plasma chemistry is the effect of residual chlorine or chlorinated etch residues remaining on the sidewalls of etched features, leading to a degradation of the magnetic properties. To avoid this problem, we employed two different processing methods. The first one is applying several different cleaning procedures, including de-ionized water rinsing or in-situ exposure to H2, O2 or SF6 plasmas. Very stable magnetic properties were achieved over a period of ˜6 months except O2 plasma treated structures, with no evidence of corrosion, provided chlorinated etch residues were removed by post-etch cleaning. The second method is using non-corrosive gas chemistries such as CO/NH3 or CO2/NH3. There is a small chemical contribution to the etch mechanism (i.e. formation of metal carbonyls) as determined by a comparison with Ar and N2 physical sputtering. The discharge should be NH3-rich to achieve the highest etch rates. Several different mask materials were investigated, including photoresist, thermal oxide and deposited oxide. Photoresist etches very rapidly in CO/NH 3 and use of a hard mask is necessary to achieve pattern transfer. Due to its physically dominated nature, the CO/NH3 chemistry appears suited to shallow etch depth (≤0.5mum) applications, but mask erosion leads to sloped feature sidewalls for deeper features.

Controlled gas-liquid interfacial plasmas for synthesis of nano-bio-carbon conjugate materials

NASA Astrophysics Data System (ADS)

Kaneko, Toshiro; Hatakeyama, Rikizo

2018-01-01

Plasmas generated in contact with a liquid have been recognized to be a novel reactive field in nano-bio-carbon conjugate creation because several new chemical reactions have been yielded at the gas-liquid interface, which were induced by the physical dynamics of non-equilibrium plasmas. One is the ion irradiation to a liquid, which caused the spatially selective dissociation of the liquid and the generation of additive reducing and oxidizing agents, resulting in the spatially controlled synthesis of nanostructures. The other is the electron irradiation to a liquid, which directly enhanced the reduction action at the plasma-liquid interface, resulting in temporally controlled nanomaterial synthesis. Using this novel reaction field, gold nanoparticles with controlled interparticle distance were synthesized using carbon nanotubes as a template. Furthermore, nanoparticle-biomolecule conjugates and nanocarbon-biomolecule conjugates were successfully synthesized by an aqueous-solution contact plasma and an electrolyte plasma, respectively, which were rapid and low-damage processes suitable for nano-bio-carbon conjugate materials.

Gas and plasma dynamics of RF discharge jet of low pressure in a vacuum chamber with flat electrodes and inside tube, influence of RF discharge on the steel surface parameters

NASA Astrophysics Data System (ADS)

Khristoliubova, V. I.; Kashapov, N. F.; Shaekhov, M. F.

2016-06-01

Researches results of the characteristics of the RF discharge jet of low pressure and the discharge influence on the surface modification of high speed and structural steels are introduced in the article. Gas dynamics, power and energy parameters of the RF low pressure discharge flow in the discharge chamber and the electrode gap are studied in the presence of the materials. Plasma flow rate, discharge power, the concentration of electrons, the density of RF power, the ion current density, and the energy of the ions bombarding the surface materials are considered for the definition of basic properties crucial for the process of surface modification of materials as they were put in the plasma jet. The influence of the workpiece and effect of products complex configuration on the RF discharge jet of low pressure is defined. The correlation of the input parameters of the plasma unit on the characteristics of the discharge is established.

Microstructural Evolution of Nanocrystalline Diamond Films Due to CH4/Ar/H2 Plasma Post-Treatment Process.

PubMed

Lin, Sheng-Chang; Yeh, Chien-Jui; Manoharan, Divinah; Leou, Keh-Chyang; Lin, I-Nan

2015-10-07

Plasma post-treatment process was observed to markedly enhance the electron field emission (EFE) properties of ultrananocrystalline diamond (UNCD) films. TEM examinations reveal that the prime factor which improves the EFE properties of these films is the coalescence of ultrasmall diamond grains (∼5 nm) forming large diamond grains about hundreds of nanometers accompanied by the formation of nanographitic clusters along the grain boundaries due to the plasma post-treatment process. OES studies reveal the presence of large proportion of atomic hydrogen and C2 (or CH) species, which are the main ingredients that altered the granular structure of the UNCD films. In the post-treatment process, the plasma interacts with the diamond films by a diffusion process. The recrystallization of diamond grains started at the surface region of the material, and the interaction zone increased with the post-treatment period. The entire diamond film can be converted into a nanocrystalline granular structure when post-treated for a sufficient length of time.

Anisotropic diamond etching through thermochemical reaction between Ni and diamond in high-temperature water vapour.

PubMed

Nagai, Masatsugu; Nakanishi, Kazuhiro; Takahashi, Hiraku; Kato, Hiromitsu; Makino, Toshiharu; Yamasaki, Satoshi; Matsumoto, Tsubasa; Inokuma, Takao; Tokuda, Norio

2018-04-27

Diamond possesses excellent physical and electronic properties, and thus various applications that use diamond are under development. Additionally, the control of diamond geometry by etching technique is essential for such applications. However, conventional wet processes used for etching other materials are ineffective for diamond. Moreover, plasma processes currently employed for diamond etching are not selective, and plasma-induced damage to diamond deteriorates the device-performances. Here, we report a non-plasma etching process for single crystal diamond using thermochemical reaction between Ni and diamond in high-temperature water vapour. Diamond under Ni films was selectively etched, with no etching at other locations. A diamond-etching rate of approximately 8.7 μm/min (1000 °C) was successfully achieved. To the best of our knowledge, this rate is considerably greater than those reported so far for other diamond-etching processes, including plasma processes. The anisotropy observed for this diamond etching was considerably similar to that observed for Si etching using KOH.

Computational study of sheath structure in oxygen containing plasmas at medium pressures

NASA Astrophysics Data System (ADS)

Hrach, Rudolf; Novak, Stanislav; Ibehej, Tomas; Hrachova, Vera

2016-09-01

Plasma mixtures containing active species are used in many plasma-assisted material treatment technologies. The analysis of such systems is rather difficult, as both physical and chemical processes affect plasma properties. A combination of experimental and computational approaches is the best suited, especially at higher pressures and/or in chemically active plasmas. The first part of our study of argon-oxygen mixtures was based on experimental results obtained in the positive column of DC glow discharge. The plasma was analysed by the macroscopic kinetic approach which is based on the set of chemical reactions in the discharge. The result of this model is a time evolution of the number densities of each species. In the second part of contribution the detailed analysis of processes taking place during the interaction of oxygen containing plasma with immersed substrates was performed, the results of the first model being the input parameters. The used method was the particle simulation technique applied to multicomponent plasma. The sheath structure and fluxes of charged particles to substrates were analysed in the dependence on plasma pressure, plasma composition and surface geometry.

Metal- matrix composite processing technologies for aircraft engine applications

NASA Astrophysics Data System (ADS)

Pank, D. R.; Jackson, J. J.

1993-06-01

Titanium metal-matrix composites (MMC) are prime candidate materials for aerospace applications be-cause of their excellent high-temperature longitudinal strength and stiffness and low density compared with nickel- and steel-base materials. This article examines the steps GE Aircraft Engines (GEAE) has taken to develop an induction plasma deposition (IPD) processing method for the fabrication of Ti6242/SiC MMC material. Information regarding process methodology, microstructures, and mechani-cal properties of consolidated MMC structures will be presented. The work presented was funded under the GE-Aircraft Engine IR & D program.

The role and application of ion beam analysis for studies of plasma-facing components in controlled fusion devices

NASA Astrophysics Data System (ADS)

Rubel, Marek; Petersson, Per; Alves, Eduardo; Brezinsek, Sebastijan; Coad, Joseph Paul; Heinola, Kalle; Mayer, Matej; Widdowson, Anna

2016-03-01

First wall materials in controlled fusion devices undergo serious modification by several physical and chemical processes arising from plasma-wall interactions. Detailed information is required for the assessment of material lifetime and accumulation of hydrogen isotopes in wall materials. The intention of this work is to give a concise overview of key issues in the characterization of plasma-facing materials and components in tokamaks, especially in JET with an ITER-Like Wall. IBA techniques play a particularly prominent role here because of their isotope selectivity in the low-Z range (1-10), high sensitivity and combination of several methods in a single run. The role of 3He-based NRA, RBS (standard and micro-size beam) and HIERDA in fuel retention and material migration studies is presented. The use of tracer techniques with rare isotopes (e.g. 15N) or marker layers on wall diagnostic components is described. Special instrumentation, development of equipment to enhance research capabilities and issues in handling of contaminated materials are addressed.

Predicting synergy in atomic layer etching

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kanarik, Keren J.; Tan, Samantha; Yang, Wenbing

2017-03-27

Atomic layer etching (ALE) is a multistep process used today in manufacturing for removing ultrathin layers of material. In this article, the authors report on ALE of Si, Ge, C, W, GaN, and SiO 2 using a directional (anisotropic) plasma-enhanced approach. The authors analyze these systems by defining an “ALE synergy” parameter which quantifies the degree to which a process approaches the ideal ALE regime. This parameter is inspired by the ion-neutral synergy concept introduced in the 1979 paper by Coburn and Winters. ALE synergy is related to the energetics of underlying surface interactions and is understood in terms ofmore » energy criteria for the energy barriers involved in the reactions. Synergistic behavior is observed for all of the systems studied, with each exhibiting behavior unique to the reactant–material combination. By systematically studying atomic layer etching of a group of materials, the authors show that ALE synergy scales with the surface binding energy of the bulk material. This insight explains why some materials are more or less amenable to the directional ALE approach. Furthermore, they conclude that ALE is both simpler to understand than conventional plasma etch processing and is applicable to metals, semiconductors, and dielectrics.« less

Tubular filamentation for laser material processing

PubMed Central

Xie, Chen; Jukna, Vytautas; Milián, Carles; Giust, Remo; Ouadghiri-Idrissi, Ismail; Itina, Tatiana; Dudley, John M.; Couairon, Arnaud; Courvoisier, Francois

2015-01-01

An open challenge in the important field of femtosecond laser material processing is the controlled internal structuring of dielectric materials. Although the availability of high energy high repetition rate femtosecond lasers has led to many advances in this field, writing structures within transparent dielectrics at intensities exceeding 1013 W/cm2 has remained difficult as it is associated with significant nonlinear spatial distortion. This letter reports the existence of a new propagation regime for femtosecond pulses at high power that overcomes this challenge, associated with the generation of a hollow uniform and intense light tube that remains propagation invariant even at intensities associated with dense plasma formation. This regime is seeded from higher order nondiffracting Bessel beams, which carry an optical vortex charge. Numerical simulations are quantitatively confirmed by experiments where a novel experimental approach allows direct imaging of the 3D fluence distribution within transparent solids. We also analyze the transitions to other propagation regimes in near and far fields. We demonstrate how the generation of plasma in this tubular geometry can lead to applications in ultrafast laser material processing in terms of single shot index writing, and discuss how it opens important perspectives for material compression and filamentation guiding in atmosphere. PMID:25753215

Design, modeling, and diagnostics of microplasma generation at microwave frequency

NASA Astrophysics Data System (ADS)

Miura, Naoto

Plasmas are partially ionized gases that find wide utility in the processing of materials, especially in integrated circuit fabrication. Most industrial applications of plasma occur in near-vacuum where the electrons are hot (>10,000 K) but the gas remains near room temperature. Typical atmospheric plasmas, such as arcs, are hot and destructive to sensitive materials. Recently the emerging field of microplasmas has demonstrated that atmospheric ionization of cold gases is possible if the plasma is microscopic. This dissertation investigates the fundamental physical properties of two classes of microplasma, both driven by microwave electric fields. The extension of point-source microplasmas into a line-shaped plasma is also described. The line-shape plasma is important for atmospheric processing of materials using roll-coating. Microplasma generators driven near 1 GHz were designed using microstrip transmission lines and characterized using argon near atmospheric pressure. The electrical characteristics of the microplasma including the discharge voltage, current and resistance were estimated by comparing the experimental power reflection coefficient to that of an electromagnetic simulation. The gas temperature, argon metastable density and electron density were obtained by optical absorption and emission spectroscopy. The microscopic internal plasma structure was probed using spatially-resolved diode laser absorption spectroscopy of excited argon states. The spatially resolved diagnostics revealed that argon metastable atoms were depleted within the 200mum core of the microplasma where the electron density was maximum. Two microplasma generators, the split-ring resonator (SRR) and the transmission line (T-line) generator, were compared. The SRR ran efficiently with a high impedance plasma (>1000 O) and was stabilized by the self-limiting of absorbed power (<1W) as a lower impedance plasma caused an impedance mismatch. Gas temperatures were <1000 K and electron densities were ~1020 m-3, conditions which are favorable for treatment of delicate materials. The T-line generator ran most efficiently with an intense, low impedance plasma that matched the impedance of the T-line (35 O). With the T-line generator, the absorbed power could exceed 20W, which created an electron density of 1021 m-3, but the gas temperature exceeded 2000 K. Finally, line-shaped microplasmas based on resonant and non-resonant configurations were developed, tested, and analyzed.

Wall ablation of heated compound-materials into non-equilibrium discharge plasmas

NASA Astrophysics Data System (ADS)

Wang, Weizong; Kong, Linghan; Geng, Jinyue; Wei, Fuzhi; Xia, Guangqing

2017-02-01

The discharge properties of the plasma bulk flow near the surface of heated compound-materials strongly affects the kinetic layer parameters modeled and manifested in the Knudsen layer. This paper extends the widely used two-layer kinetic ablation model to the ablation controlled non-equilibrium discharge due to the fact that the local thermodynamic equilibrium (LTE) approximation is often violated as a result of the interaction between the plasma and solid walls. Modifications to the governing set of equations, to account for this effect, are derived and presented by assuming that the temperature of the electrons deviates from that of the heavy particles. The ablation characteristics of one typical material, polytetrafluoroethylene (PTFE) are calculated with this improved model. The internal degrees of freedom as well as the average particle mass and specific heat ratio of the polyatomic vapor, which strongly depends on the temperature, pressure and plasma non-equilibrium degree and plays a crucial role in the accurate determination of the ablation behavior by this model, are also taken into account. Our assessment showed the significance of including such modifications related to the non-equilibrium effect in the study of vaporization of heated compound materials in ablation controlled arcs. Additionally, a two-temperature magneto-hydrodynamic (MHD) model accounting for the thermal non-equilibrium occurring near the wall surface is developed and applied into an ablation-dominated discharge for an electro-thermal chemical launch device. Special attention is paid to the interaction between the non-equilibrium plasma and the solid propellant surface. Both the mass exchange process caused by the wall ablation and plasma species deposition as well as the associated momentum and energy exchange processes are taken into account. A detailed comparison of the results of the non-equilibrium model with those of an equilibrium model is presented. The non-equilibrium results show a non-equilibrium region near the plasma-wall interaction region and this indicates the need for the consideration of the influence of the possible departure from LTE in the plasma bulk on the determination of ablation rate.

Plasma Methods of Obtainment of Multifunctional Composite Materials, Dispersion-Hardened by Nanoparticles

NASA Astrophysics Data System (ADS)

Sizonenko, O. N.; Grigoryev, E. G.; Pristash, N. S.; Zaichenko, A. D.; Torpakov, A. S.; Lypian, Ye. V.; Tregub, V. A.; Zholnin, A. G.; Yudin, A. V.; Kovalenko, A. A.

2017-09-01

High voltage electric discharge (HVED) in disperse system "hydrocarbon liquid - powder" due to impact of plasma discharge channel, electromagnetic fields, shock waves mechanical impact, hydro flows and volume microcavitation leads to synthesis of nanocarbon, metal powders dispersion and synthesis of micro- (from 10-6 to 10-7 m) and nanosized (from 10-7 to 10-9 m) composite powders of hardening phases. Spark plasma sintering (SPS) of powder mixtures allows targeted control of grain growth rate and thus allows obtainment of multifunctional composite materials dispersion hardened by nanoparticles. Processes of HVED synthesis of micro- and nanosized powders of new compositions from elemental metal powders and their mixtures with the subsequent application of high-speed SPS of obtained powders create conditions for increase of strength (by 10-20 %), hardness and wear-resistance (by 30-60 %) of obtained materials.

Plasma Processing with a One Atmosphere Uniform Glow Discharge Plasma (OAUGDP)

NASA Astrophysics Data System (ADS)

Reece Roth, J.

2000-10-01

The vast majority of all industrial plasma processing is conducted with glow discharges at pressures below 10 torr. This has limited applications to high value workpieces as a result of the large capital cost of vacuum systems and the production constraints of batch processing. It has long been recognized that glow discharges would play a much larger industrial role if they could be operated at one atmosphere. The One Atmosphere Uniform Glow Discharge Plasma (OAUGDP) has been developed at the University of Tennessee Plasma Sciences Laboratory. The OAUGDP is non-thermal RF plasma with the time-resolved characteristics of a classical low pressure DC normal glow discharge. An interdisciplinary team was formed to conduct exploratory investigations of the physics and applications of the OAUGDP. This team includes collaborators from the UTK Textiles and Nonwovens Development Center (TANDEC) and the Departments of Electrical and Computer Engineering, Microbiology, Food Science and Technology, and Mechanical and Aerospace Engineering and Engineering Science. Exploratory tests were conducted on a variety of potential plasma processing and other applications. These include the use of OAUGDP to sterilize medical and dental equipment and air filters; diesel soot removal; plasma aerodynamic effects; electrohydrodynamic (EDH) flow control of the neutral working gas; increasing the surface energy of materials; increasing the wettability and wickability of fabrics; and plasma deposition and directional etching. A general overview of these topics will be presented.

Amine Enrichment of Thin-Film Composite Membranes via Low Pressure Plasma Polymerization for Antimicrobial Adhesion.

PubMed

Reis, Rackel; Dumée, Ludovic F; He, Li; She, Fenghua; Orbell, John D; Winther-Jensen, Bjorn; Duke, Mikel C

2015-07-15

Thin-film composite membranes, primarily based on poly(amide) (PA) semipermeable materials, are nowadays the dominant technology used in pressure driven water desalination systems. Despite offering superior water permeation and salt selectivity, their surface properties, such as their charge and roughness, cannot be extensively tuned due to the intrinsic fabrication process of the membranes by interfacial polymerization. The alteration of these properties would lead to a better control of the materials surface zeta potential, which is critical to finely tune selectivity and enhance the membrane materials stability when exposed to complex industrial waste streams. Low pressure plasma was employed to introduce amine functionalities onto the PA surface of commercially available thin-film composite (TFC) membranes. Morphological changes after plasma polymerization were analyzed by SEM and AFM, and average surface roughness decreased by 29%. Amine enrichment provided isoelectric point changes from pH 3.7 to 5.2 for 5 to 15 min of plasma polymerization time. Synchrotron FTIR mappings of the amine-modified surface indicated the addition of a discrete 60 nm film to the PA layer. Furthermore, metal affinity was confirmed by the enhanced binding of silver to the modified surface, supported by an increased antimicrobial functionality with demonstrable elimination of E. coli growth. Essential salt rejection was shown minimally compromised for faster polymerization processes. Plasma polymerization is therefore a viable route to producing functional amine enriched thin-film composite PA membrane surfaces.

Plasma arc welding repair of space flight hardware

NASA Technical Reports Server (NTRS)

Hoffman, David S.

1993-01-01

Repair and refurbishment of flight and test hardware can extend the useful life of very expensive components. A technique to weld repair the main combustion chamber of space shuttle main engines has been developed. The technique uses the plasma arc welding process and active cooling to seal cracks and pinholes in the hot-gas wall of the main combustion chamber liner. The liner hot-gas wall is made of NARloyZ, a copper alloy previously thought to be unweldable using conventional arc welding processes. The process must provide extensive heat input to melt the high conductivity NARloyZ while protecting the delicate structure of the surrounding material. The higher energy density of the plasma arc process provides the necessary heat input while active water cooling protects the surrounding structure. The welding process is precisely controlled using a computerized robotic welding system.

Foundations of low-temperature plasma enhanced materials synthesis and etching

NASA Astrophysics Data System (ADS)

Oehrlein, Gottlieb S.; Hamaguchi, Satoshi

2018-02-01

Low temperature plasma (LTP)-based synthesis of advanced materials has played a transformational role in multiple industries, including the semiconductor industry, liquid crystal displays, coatings and renewable energy. Similarly, the plasma-based transfer of lithographically defined resist patterns into other materials, e.g. silicon, SiO2, Si3N4 and other electronic materials, has led to the production of nanometer scale devices that are the basis of the information technology, microsystems, and many other technologies based on patterned films or substrates. In this article we review the scientific foundations of both LTP-based materials synthesis at low substrate temperature and LTP-based isotropic and directional etching used to transfer lithographically produced resist patterns into underlying materials. We cover the fundamental principles that are the basis of successful application of the LTP techniques to technological uses and provide an understanding of technological factors that may control or limit material synthesis or surface processing with the use of LTP. We precede these sections with a general discussion of plasma surface interactions, the LTP-generated particle fluxes including electrons, ions, radicals, excited neutrals and photons that simultaneously contact and modify surfaces. The surfaces can be in the line of sight of the discharge or hidden from direct interaction for structured substrates. All parts of the article are extensively referenced, which is intended to help the reader study the topics discussed here in more detail.

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies.

PubMed

Faraz, Tahsin; Knoops, Harm C M; Verheijen, Marcel A; van Helvoirt, Cristian A A; Karwal, Saurabh; Sharma, Akhil; Beladiya, Vivek; Szeghalmi, Adriana; Hausmann, Dennis M; Henri, Jon; Creatore, Mariadriana; Kessels, Wilhelmus M M

2018-04-18

Oxide and nitride thin-films of Ti, Hf, and Si serve numerous applications owing to the diverse range of their material properties. It is therefore imperative to have proper control over these properties during materials processing. Ion-surface interactions during plasma processing techniques can influence the properties of a growing film. In this work, we investigated the effects of controlling ion characteristics (energy, dose) on the properties of the aforementioned materials during plasma-enhanced atomic layer deposition (PEALD) on planar and 3D substrate topographies. We used a 200 mm remote PEALD system equipped with substrate biasing to control the energy and dose of ions by varying the magnitude and duration of the applied bias, respectively, during plasma exposure. Implementing substrate biasing in these forms enhanced PEALD process capability by providing two additional parameters for tuning a wide range of material properties. Below the regimes of ion-induced degradation, enhancing ion energies with substrate biasing during PEALD increased the refractive index and mass density of TiO x and HfO x and enabled control over their crystalline properties. PEALD of these oxides with substrate biasing at 150 °C led to the formation of crystalline material at the low temperature, which would otherwise yield amorphous films for deposition without biasing. Enhanced ion energies drastically reduced the resistivity of conductive TiN x and HfN x films. Furthermore, biasing during PEALD enabled the residual stress of these materials to be altered from tensile to compressive. The properties of SiO x were slightly improved whereas those of SiN x were degraded as a function of substrate biasing. PEALD on 3D trench nanostructures with biasing induced differing film properties at different regions of the 3D substrate. On the basis of the results presented herein, prospects afforded by the implementation of this technique during PEALD, such as enabling new routes for topographically selective deposition on 3D substrates, are discussed.

FOREWORD: 23rd National Symposium on Plasma Science & Technology (PLASMA-2008)

NASA Astrophysics Data System (ADS)

Das, A. K.

2010-01-01

The Twentieth Century has been a defining period for Plasma Science and Technology. The state of ionized matter, so named by Irving Langmuir in the early part of twentieth century, has now evolved in to a multidisciplinary area with scientists and engineers from various specializations working together to exploit the unique properties of the plasma medium. There have been great improvements in the basic understanding of plasmas as a many body system bound by complex collective Coulomb interactions of charges, atoms, molecules, free radicals and photons. Simultaneously, many advanced plasma based technologies are increasingly being implemented for industrial and societal use. The emergence of the multination collaborative project International Thermonuclear Experimental Reactor (ITER) project has provided the much needed boost to the researchers working on thermonuclear fusion plasmas. In addition, the other plasma applications like MHD converters, hydrogen generation, advanced materials (synthesis, processing and surface modification), environment (waste beneficiation, air and water pollution management), nanotechnology (synthesis, deposition and etching), light production, heating etc are actively being pursued in governmental and industrial sectors. For India, plasma science and technology has traditionally remained an important area of research. It was nearly a century earlier that the Saha ionization relation pioneered the way to interpret experimental data from a vast range of near equilibrium plasmas. Today, Indian research contributions and technology demonstration capabilities encompass thermonuclear fusion devices, nonlinear plasma phenomena, plasma accelerators, beam plasma interactions, dusty and nonneutral plasmas, industrial plasmas and plasma processing of materials, nano synthesis and structuring, astrophysical and space plasmas etc. India's participation in the ITER programme is now reflected in increased interest in the research and development efforts on Tokamak technology and physics of magnetized fusion plasmas. Our industries have already adopted a large number of plasma processes related to manufacturing, lighting and surface engineering. Indian universities and National Institutes have successfully taken up research projects and building of demonstration equipment that are being used in strategic as well as other industrial applications. In addition, and more importantly, plasma science has triggered research and development effort in many related areas like power supplies, specialized instrumentation and controls, magnets, diagnostics and monitoring, lasers, electron beams, vacuum systems, thermal engineering, material science, fluid dynamics, molecular and nano engineering, molecular chemistry etc. In short, plasma science and technology in India has reached a stage of maturity that can be harnessed for industrial and societal use. The expertise and core competence developed over the years need to be sustained through interactions among researchers as well as nurturing of new research efforts. The Annual Plasma Symposiums have eminently worked towards achievement of that purpose. Like all years, Plasma - 2008 is built around the entire national effort in this field with a special focus on 'Plasmas in Nuclear Fuel Cycle (PANFC)'. The program includes several plenary lectures, invited talks and contributed papers. The manuscripts have been peer reviewed and compiled in the form of Conference Proceedings. I am sure that the online proceedings will be useful and serve as a valuable reference material for active researchers in this field. I would like to take this opportunity to gratefully acknowledge the help and guidance of the National Advisory Committee Chaired by Professor P K Kaw, Director, Institute of Plasma Research, Gandhinagar during the organization of this symposium. My sincere thanks to Dr S Banerjee, Director, Bhabha Atomic Research Center, an acknowledged expert in the field of Materials Science and Technology, for delivering the key note address to set the tenor of the symposium. I would also like to thank the Plasma Science Society of India (PSSI) for agreeing to hold this important event at BARC. Thanks are due to Dr L M Gantayet, Director, BTDG, BARC and chairman, Scientific Program Committee and all my colleagues in the Symposium Organizing Committee who have made this symposium possible. Finally, our thanks to all the Funding agencies, Board of Research in Nuclear Science, Department of Science and Technology, The Board of Fusion Research, and all industrial exhibitor and sponsors for their unstinted support and encouragement. Dr A K Das Chairman, Organizing Committee Bhabha Atomic Research Center, Mumbai

Synthesis of a fine neurological electrode by plasma polymerization processing.

PubMed

Cannon, J G; Dillon, R O; Bunshah, R F; Crandall, P H; Dymond, A M

1980-05-01

This research is part of a continuing program for the development of a coaxial depth electrode for research and diagnostic studies of neurological diseases. The requirements for this electrode include (1) strength and resistance to buckling sufficient to ensure self-forced penetration of brain tissue to a depth of 6 cm; (2) biocompatibility of the materials employed; (3) resistance to brittle fracture; and (4) a total diameter of less than 200 micrometer to minimize tissue damage. Earlier synthesis efforts using chemical vapor deposition techniques have been successful, although the process yield was 40% and an outer insulating layer had yet to be deposited. Plasma polymerization processes have been employed to realize an increase in the yield and provide an outer insulating layer. The starting material is W-26 at.% Re wire, nominally 125 micrometer in diameter. Hexamethyldisilazane(CH3)3SiNHSi(CH3)3 is used to deposit the insulating layers. The paper describes factors influencing the choice of materials, deposition techniques, and properties of electrodes.

Chondrules born in plasma? Simulation of gas-grain interaction using plasma arcs with applications to chondrule and cosmic spherule formation

NASA Astrophysics Data System (ADS)

Morlok, A.; Sutton, Y. C.; Braithwaite, N. St. J.; Grady, Monica M.

2012-12-01