Sample records for plasma processing equipment

  1. Plasma Diagnostics: Use and Justification in an Industrial Environment

    NASA Astrophysics Data System (ADS)

    Loewenhardt, Peter

    1998-10-01

    The usefulness and importance of plasma diagnostics have played a major role in the development of plasma processing tools in the semiconductor industry. As can be seen through marketing materials from semiconductor equipment manufacturers, results from plasma diagnostic equipment can be a powerful tool in selling the technological leadership of tool design. Some diagnostics have long been used for simple process control such as optical emission for endpoint determination, but in recent years more sophisticated and involved diagnostic tools have been utilized in chamber and plasma source development and optimization. It is now common to find an assortment of tools at semiconductor equipment companies such as Langmuir probes, mass spectrometers, spatial optical emission probes, impedance, ion energy and ion flux probes. An outline of how the importance of plasma diagnostics has grown at an equipment manufacturer over the last decade will be given, with examples of significant and useful results obtained. Examples will include the development and optimization of an inductive plasma source, trends and hardware effects on ion energy distributions, mass spectrometry influences on process development and investigations of plasma-wall interactions. Plasma diagnostic focus, in-house development and proliferation in an environment where financial justification requirements are both strong and necessary will be discussed.

  2. 10 CFR Appendix G to Part 110 - Illustrative List of Plasma Separation Enrichment Plant Equipment and Components Under NRC Export...

    Code of Federal Regulations, 2010 CFR

    2010-01-01

    ... 10 Energy 2 2010-01-01 2010-01-01 false Illustrative List of Plasma Separation Enrichment Plant... Appendix G to Part 110—Illustrative List of Plasma Separation Enrichment Plant Equipment and Components Under NRC Export Licensing Authority Note—In the plasma separation process, a plasma of uranium ions...

  3. 10 CFR Appendix G to Part 110 - Illustrative List of Plasma Separation Enrichment Plant Equipment and Components Under NRC Export...

    Code of Federal Regulations, 2012 CFR

    2012-01-01

    ... 10 Energy 2 2012-01-01 2012-01-01 false Illustrative List of Plasma Separation Enrichment Plant... Appendix G to Part 110—Illustrative List of Plasma Separation Enrichment Plant Equipment and Components Under NRC Export Licensing Authority Note—In the plasma separation process, a plasma of uranium ions...

  4. 10 CFR Appendix G to Part 110 - Illustrative List of Plasma Separation Enrichment Plant Equipment and Components Under NRC Export...

    Code of Federal Regulations, 2011 CFR

    2011-01-01

    ... 10 Energy 2 2011-01-01 2011-01-01 false Illustrative List of Plasma Separation Enrichment Plant... Appendix G to Part 110—Illustrative List of Plasma Separation Enrichment Plant Equipment and Components Under NRC Export Licensing Authority Note—In the plasma separation process, a plasma of uranium ions...

  5. 10 CFR Appendix G to Part 110 - Illustrative List of Plasma Separation Enrichment Plant Equipment and Components Under NRC Export...

    Code of Federal Regulations, 2013 CFR

    2013-01-01

    ... 10 Energy 2 2013-01-01 2013-01-01 false Illustrative List of Plasma Separation Enrichment Plant... Appendix G to Part 110—Illustrative List of Plasma Separation Enrichment Plant Equipment and Components Under NRC Export Licensing Authority Note—In the plasma separation process, a plasma of uranium ions...

  6. 10 CFR Appendix G to Part 110 - Illustrative List of Plasma Separation Enrichment Plant Equipment and Components Under NRC Export...

    Code of Federal Regulations, 2014 CFR

    2014-01-01

    ... 10 Energy 2 2014-01-01 2014-01-01 false Illustrative List of Plasma Separation Enrichment Plant... Appendix G to Part 110—Illustrative List of Plasma Separation Enrichment Plant Equipment and Components Under NRC Export Licensing Authority Note: In the plasma separation process, a plasma of uranium ions...

  7. Cold Atmospheric Plasma Technology for Decontamination of Space Equipment

    NASA Astrophysics Data System (ADS)

    Thomas, Hubertus; Rettberg, Petra; Shimizu, Tetsuji; Thoma, Markus; Morfill, Gregor; Zimmermann, Julia; Müller, Meike; Semenov, Igor

    2016-07-01

    Cold atmospheric plasma (CAP) technology is very fast and effective in inactivation of all kinds of pathogens. It is used in hygiene and especially in medicine, since the plasma treatment can be applied to sensitive surfaces, like skin, too. In a first study to use CAP for the decontamination of space equipment we could show its potential as a quite promising alternative to the standard "dry heat" and H2O2 methods [Shimizu et al. Planetary and Space Science, 90, 60-71. (2014)]. In a follow-on study we continue the investigations to reach high application level of the technology. First, we redesign the actual setup to a plasma-gas circulation system, increasing the effectivity of inactivation and the sustainability. Additionally, we want to learn more about the plasma chemistry processes involved in the inactivation. Therefore, we perform detailed plasma and gas measurements and compare them to numerical simulations. The latter will finally be used to scale the decontamination system to sizes useful also for larger space equipment. Typical materials relevant for space equipment will be tested and investigated on surface material changes due to the plasma treatment. Additionally, it is planned to use electronic boards and compare their functionality before and after the CAP expose. We will give an overview on the status of the plasma decontamination project funded by the Bavarian Ministry of Economics.

  8. Recycling of the Electronic Waste Applying the Plasma Reactor Technology

    NASA Astrophysics Data System (ADS)

    Lázár, Marián; Jasminská, Natália; Čarnogurská, Mária; Dobáková, Romana

    2016-12-01

    The following paper discusses a high-temperature gasification process and melting of electronic components and computer equipment using plasma reactor technology. It analyses the marginal conditions of batch processing, as well as the formation of solid products which result from the procedure of waste processing. Attention is also paid to the impact of the emerging products on the environment.

  9. JPRS Report. Soviet Union, EKO: Economics & Organization of Industrial Production No. 7, July 1987.

    DTIC Science & Technology

    1987-12-03

    to the question of the interest in plasma equip- ment in various branches of the national economy. Plasma processes occupy a leading position among...the principally new technologies that are based on process - ing concentrated flows of energy. Even today there are more than 50 of them. An entire...branch of chemistry has been formed—plasma chemistry, for which it is typical to have processes with an average mass temperature of the working gas

  10. Effect of the self-pumped limiter concept on the tritium fuel cycle

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Finn, P.A.; Sze, D.K.; Hassanein, A.

    1988-01-01

    The self-pumped limiter concept for impurity control of the plasma of a fusion reactor has a major impact on the design of the tritium systems. To achieve a sustained burn, conventional limiters and divertors remove large quantities of unburnt tritium and deuterium from the plasma which must be then recycled using a plasma processing system. The self-pumped limiter which does not remove the hydrogen species, does not require any plasma processing equipment. The blanket system and the coolant processing systems acquire greater importance with the use of this unconventional impurity control system. 3 refs., 2 figs.

  11. Applications of Pulsed Power in Advanced Oxidation and Reduction Processes for Pollution Control

    DTIC Science & Technology

    1993-06-01

    electrical driver pulse width and rise time, electrical drive circuit coupling to plasma cells, and the role of UV light in the plasma chemistry and...will permit industrial service. Basic understanding of the plasma chemistry has evolved to the point where trends and equipment scaling can be

  12. Feasibility Study for a Plasma Dynamo Facility to Investigate Fundamental Processes in Plasma Astrophysics. Final report

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Forest, Cary B.

    The scientific equipment purchased on this grant was used on the Plasma Dynamo Prototype Experiment as part of Professor Forest's feasibility study for determining if it would be worthwhile to propose building a larger plasma physics experiment to investigate various fundamental processes in plasma astrophysics. The initial research on the Plasma Dynamo Prototype Experiment was successful so Professor Forest and Professor Ellen Zweibel at UW-Madison submitted an NSF Major Research Instrumentation proposal titled "ARRA MRI: Development of a Plasma Dynamo Facility for Experimental Investigations of Fundamental Processes in Plasma Astrophysics." They received funding for this project and the Plasma Dynamomore » Facility also known as the "Madison Plasma Dynamo Experiment" was constructed. This experiment achieved its first plasma in the fall of 2012 and U.S. Dept. of Energy Grant No. DE-SC0008709 "Experimental Studies of Plasma Dynamos," now supports the research.« less

  13. Cold plasma processing of local planetary ores for oxygen and metallurgically important metals

    NASA Technical Reports Server (NTRS)

    Lynch, D. C.; Bullard, D.; Ortega, R.

    1990-01-01

    The utilization of a cold plasma in chlorination processing is described. Essential equipment and instruments were received, the experimental apparatus assembled and tested, and preliminary experiments conducted. The results of the latter lend support to the original hypothesis: a cold plasma can both significantly enhance and bias chemical reactions. In two separate experiments, a cold plasma was used to reduce TiCl4 vapor and chlorinate ilmenite. The latter, reacted in an argon-chlorine plasma, yielded oxygen. The former experiment reveals that chlorine can be recovered as HCl vapor from metal chlorides in a hydrogen plasma. Furthermore, the success of the hydrogen experiments has lead to an analysis of the feasibility of direct hydrogen reduction of metal oxides in a cold plasma. That process would produce water vapor and numerous metal by-products.

  14. Apparatus and method for carbon fiber surface treatment

    DOEpatents

    Paulauskas, Felix L; Sherman, Daniel M

    2014-06-03

    An apparatus and method for enhancing the surface energy and/or surface chemistry of carbon fibers involves exposing the fibers to direct or indirect contact with atmospheric pressure plasma generated using a background gas containing at least some oxygen or other reactive species. The fiber may be exposed directly to the plasma, provided that the plasma is nonfilamentary, or the fiber may be exposed indirectly through contact with gases exhausting from a plasma discharge maintained in a separate volume. In either case, the process is carried out at or near atmospheric pressure, thereby eliminating the need for vacuum equipment. The process may be further modified by moistening the fibers with selected oxygen-containing liquids before exposure to the plasma.

  15. Apparatus and method for carbon fiber surface treatment

    DOEpatents

    Paulauskas, Felix L [Knoxville, TN; Sherman, Daniel M [Knoxville, TN

    2012-07-24

    An apparatus and method for enhancing the surface energy and/or surface chemistry of carbon fibers involves exposing the fibers to direct or indirect contact with atmospheric pressure plasma generated using a background gas containing at least some oxygen or other reactive species. The fiber may be exposed directly to the plasma, provided that the plasma is nonfilamentary, or the fiber may be exposed indirectly through contact with gases exhausting from a plasma discharge maintained in a separate volume. In either case, the process is carried out at or near atmospheric pressure, thereby eliminating the need for vacuum equipment. The process may be further modified by moistening the fibers with selected oxygen-containing liquids before exposure to the plasma.

  16. Fructooligosaccharides integrity after atmospheric cold plasma and high-pressure processing of a functional orange juice.

    PubMed

    Almeida, Francisca Diva Lima; Gomes, Wesley Faria; Cavalcante, Rosane Souza; Tiwari, Brijesh K; Cullen, Patrick J; Frias, Jesus Maria; Bourke, Paula; Fernandes, Fabiano A N; Rodrigues, Sueli

    2017-12-01

    In this study, the effect of atmospheric pressure cold plasma and high-pressure processing on the prebiotic orange juice was evaluated. Orange juice containing 7g/100g of commercial fructooligosaccharides (FOS) was directly and indirectly exposed to a plasma discharge at 70kV with processing times of 15, 30, 45 and 60s. For high-pressure processing, the juice containing the same concentration of FOS was treated at 450MPa for 5min at 11.5°C in an industrial equipment (Hyperbaric, model: 300). After the treatments, the fructooligosaccharides were qualified and quantified by thin layer chromatography. The organic acids and color analysis were also evaluated. The maximal overall fructooligosaccharides degradation was found after high-pressure processing. The total color difference was <3.0 for high-pressure and plasma processing. citric and ascorbic acid (Vitamin C) showed increased content after plasma and high-pressure treatment. Thus, atmospheric pressure cold plasma and high-pressure processing can be used as non-thermal alternatives to process prebiotic orange juice. Copyright © 2017 Elsevier Ltd. All rights reserved.

  17. Computer-Controlled System for Plasma Ion Energy Auto-Analyzer

    NASA Astrophysics Data System (ADS)

    Wu, Xian-qiu; Chen, Jun-fang; Jiang, Zhen-mei; Zhong, Qing-hua; Xiong, Yu-ying; Wu, Kai-hua

    2003-02-01

    A computer-controlled system for plasma ion energy auto-analyzer was technically studied for rapid and online measurement of plasma ion energy distribution. The system intelligently controls all the equipments via a RS-232 port, a printer port and a home-built circuit. The software designed by Lab VIEW G language automatically fulfils all of the tasks such as system initializing, adjustment of scanning-voltage, measurement of weak-current, data processing, graphic export, etc. By using the system, a few minutes are taken to acquire the whole ion energy distribution, which rapidly provides important parameters of plasma process techniques based on semiconductor devices and microelectronics.

  18. Application of Laser Plasma Sources of Soft X-rays and Extreme Ultraviolet (EUV) in Imaging, Processing Materials and Photoionization Studies

    NASA Astrophysics Data System (ADS)

    Fiedorowicz, H.; Bartnik, A.; Wachulak, P. W.; Jarocki, R.; Kostecki, J.; Szczurek, M.; Ahad, I. U.; Fok, T.; Szczurek, A.; Wȩgrzyński, Ł.

    In the paper we present new applications of laser plasma sources of soft X-rays and extreme ultraviolet (EUV) in various areas of plasma physics, nanotechnology and biomedical engineering. The sources are based on a gas puff target irradiated with nanosecond laser pulses from commercial Nd: YAG lasers, generating pulses with time duration from 1 to 10 ns and energies from 0.5 to 10 J at a 10 Hz repetition rate. The targets are produced with the use of a double valve system equipped with a special nozzle to form a double-stream gas puff target which allows for high conversion efficiency of laser energy into soft X-rays and EUV without degradation of the nozzle. The sources are equipped with various optical systems to collect soft X-ray and EUV radiation and form the radiation beam. New applications of these sources in imaging, including EUV tomography and soft X-ray microscopy, processing of materials and photoionization studies are presented.

  19. Solution plasma applications for the synthesis/modification of inorganic nanostructured materials and the treatment of natural polymers

    NASA Astrophysics Data System (ADS)

    Watthanaphanit, Anyarat; Saito, Nagahiro

    2018-01-01

    Reducing the use of toxic chemicals, production steps, and time consumption are important concerns for researchers and process engineers to contribute in the quest for an efficient process in any production. If an equipment setup is simple, the process additionally becomes more profitable. Combination of the mentioned requirements has opened up various applications of the solution plasma process (SPP) — a physical means of generating plasma through an electrical discharge in a liquid medium at atmospheric pressure and room temperature. This review shows the progress of scientific research on the applications of the SPP for the synthesis/modification of inorganic nanostructured materials and the treatment of natural polymers. Development achieved in each application is demonstrated.

  20. Technical information report: Plasma melter operation, reliability, and maintenance analysis

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Hendrickson, D.W.

    1995-03-14

    This document provides a technical report of operability, reliability, and maintenance of a plasma melter for low-level waste vitrification, in support of the Hanford Tank Waste Remediation System (TWRS) Low-Level Waste (LLW) Vitrification Program. A process description is provided that minimizes maintenance and downtime and includes material and energy balances, equipment sizes and arrangement, startup/operation/maintence/shutdown cycle descriptions, and basis for scale-up to a 200 metric ton/day production facility. Operational requirements are provided including utilities, feeds, labor, and maintenance. Equipment reliability estimates and maintenance requirements are provided which includes a list of failure modes, responses, and consequences.

  1. Computational Modeling in Plasma Processing for 300 mm Wafers

    NASA Technical Reports Server (NTRS)

    Meyyappan, Meyya; Arnold, James O. (Technical Monitor)

    1997-01-01

    Migration toward 300 mm wafer size has been initiated recently due to process economics and to meet future demands for integrated circuits. A major issue facing the semiconductor community at this juncture is development of suitable processing equipment, for example, plasma processing reactors that can accomodate 300 mm wafers. In this Invited Talk, scaling of reactors will be discussed with the aid of computational fluid dynamics results. We have undertaken reactor simulations using CFD with reactor geometry, pressure, and precursor flow rates as parameters in a systematic investigation. These simulations provide guidelines for scaling up in reactor design.

  2. Emerging applications of low temperature gas plasmas in the food industry.

    PubMed

    Shaw, Alex; Shama, Gilbert; Iza, Felipe

    2015-06-16

    The global burden of foodborne disease due to the presence of contaminating micro-organisms remains high, despite some notable examples of their successful reduction in some instances. Globally, the number of species of micro-organisms responsible for foodborne diseases has increased over the past decades and as a result of the continued centralization of the food processing industry, outbreaks now have far reaching consequences. Gas plasmas offer a broad range of microbicidal capabilities that could be exploited in the food industry and against which microbial resistance would be unlikely to occur. In addition to reducing the incidence of disease by acting on the micro-organisms responsible for food spoilage, gas plasmas could also play a role in increasing the shelf-life of perishable foods and thereby reduce food wastage with positive financial and environmental implications. Treatment need not be confined to the food itself but could include food processing equipment and also the environment in which commercial food processing occurs. Moreover, gas plasmas could also be used to bring about the degradation of undesirable chemical compounds, such as allergens, toxins, and pesticide residues, often encountered on foods and food-processing equipment. The literature on the application of gas plasmas to food treatment is beginning to reveal an appreciation that attention needs also to be paid to ensuring that the key quality attributes of foods are not significantly impaired as a result of treatment. A greater understanding of both the mechanisms by which micro-organisms and chemical compounds are inactivated, and of the plasma species responsible for this is forming. This is significant, as this knowledge can then be used to design plasma systems with tailored compositions that will achieve maximum efficacy. Better understanding of the underlying interactions will also enable the design and implementation of control strategies capable of minimizing variations in plasma treatment efficacy despite perturbations in environmental and operational conditions.

  3. Feature Profile Evolution of SiO2 Trenches In Fluorocarbon Plasmas

    NASA Technical Reports Server (NTRS)

    Hwang, Helen; Govindan, T. R.; Meyyappan, M.; Arunachalam, Valli; Rauf, Shahid; Coronell, Dan; Carroll, Carol W. (Technical Monitor)

    1999-01-01

    Etching of silicon microstructures for semiconductor manufacturing in chlorine plasmas has been well characterized. The etching proceeds in a two-part process, where the chlorine neutrals passivate the Si surface and then the ions etch away SiClx. However, etching in more complicated gas mixtures and materials, such as etching of SiO2 in Ar/C4F8, requires knowledge of the ion and neutral distribution functions as a function of angle and velocity, in addition to modeling the gas surface reactions. In order to address these needs, we have developed and integrated a suite of models to simulate the etching process from the plasma reactor level to the feature profile evolution level. This arrangement allows for a better understanding, control, and prediction of the influence of equipment level process parameters on feature profile evolution. We are currently using the HPEM (Hybrid Plasma Equipment Model) and PCMCM (Plasma Chemistry Monte Carlo Model) to generate plasma properties and ion and neutral distribution functions for argon/fluorocarbon discharges in a GEC Reference Cell. These quantities are then input to the feature scale model, Simulation of Profile Evolution by Level Sets (SPELS). A surface chemistry model is used to determine the interaction of the incoming species with the substrate material and simulate the evolution of the trench profile. The impact of change of gas pressure and inductive power on the relative flux of CFx and F to the wafer, the etch and polymerization rates, and feature profiles will be examined. Comparisons to experimental profiles will also be presented.

  4. Automated Plasma Spray (APS) process feasibility study: Plasma spray process development and evaluation

    NASA Technical Reports Server (NTRS)

    Fetheroff, C. W.; Derkacs, T.; Matay, I. M.

    1979-01-01

    An automated plasma spray (APS) process was developed to apply two layer (NiCrAlY and ZrO2-12Y2O3) thermal-barrier coatings to aircraft gas turbine engine blade airfoils. The APS process hardware consists of four subsystems: a mechanical blade positioner incorporating two interlaced six-degree-of-freedom assemblies; a noncoherent optical metrology subsystem; a microprocessor-based adaptive system controller; and commercial plasma spray equipment. Over fifty JT9D first stage turbine blades specimens were coated with the APS process in preliminary checkout and evaluation studies. The best of the preliminary specimens achieved an overall coating thickness uniformity of + or - 53 micrometers, much better than is achievable manually. Factors limiting this performance were identified and process modifications were initiated accordingly. Comparative evaluations of coating thickness uniformity for manually sprayed and APS coated specimens were initiated. One of the preliminary evaluation specimens was subjected to a torch test and metallographic evaluation.

  5. Optical in situ monitoring of plasma-enhanced atomic layer deposition process

    NASA Astrophysics Data System (ADS)

    Zeeshan Arshad, Muhammad; Jo, Kyung Jae; Kim, Hyun Gi; Jeen Hong, Sang

    2018-06-01

    An optical in situ process monitoring method for the early detection of anomalies in plasma process equipment is presented. Cyclic process steps of precursor treatment and plasma reaction for the deposition of an angstrom-scale film increase their complexity to ensure the process quality. However, a small deviation in process parameters, for instance, gas flow rate, process temperature, or RF power, may jeopardize the deposited film quality. As a test vehicle for the process monitoring, we have investigated the aluminum-oxide (Al2O3) encapsulation process in plasma-enhanced atomic layer deposition (PEALD) to form a moisture and oxygen diffusion barrier in organic-light emitting diodes (OLEDs). By optical in situ monitoring, we successfully identified the reduction in oxygen flow rates in the reaction steps, which resulted in a 2.67 times increase in the water vapor transmission ratio (WVTR) of the deposited Al2O3 films. Therefore, we are convinced that the suggested in situ monitoring method is useful for the detection of process shifts or drifts that adversely affect PEALD film quality.

  6. Mechanism for Plasma Etching of Shallow Trench Isolation Features in an Inductively Coupled Plasma

    NASA Astrophysics Data System (ADS)

    Agarwal, Ankur; Rauf, Shahid; He, Jim; Choi, Jinhan; Collins, Ken

    2011-10-01

    Plasma etching for microelectronics fabrication is facing extreme challenges as processes are developed for advanced technological nodes. As device sizes shrink, control of shallow trench isolation (STI) features become more important in both logic and memory devices. Halogen-based inductively coupled plasmas in a pressure range of 20-60 mTorr are typically used to etch STI features. The need for improved performance and shorter development cycles are placing greater emphasis on understanding the underlying mechanisms to meet process specifications. In this work, a surface mechanism for STI etch process will be discussed that couples a fundamental plasma model to experimental etch process measurements. This model utilizes ion/neutral fluxes and energy distributions calculated using the Hybrid Plasma Equipment Model. Experiments are for blanket Si wafers in a Cl2/HBr/O2/N2 plasma over a range of pressures, bias powers, and flow rates of feedstock gases. We found that kinetic treatment of electron transport was critical to achieve good agreement with experiments. The calibrated plasma model is then coupled to a string-based feature scale model to quantify the effect of varying process parameters on the etch profile. We found that the operating parameters strongly influence critical dimensions but have only a subtle impact on the etch depths.

  7. Fabrication of amorphous silica nanowires via oxygen plasma treatment of polymers on silicon

    NASA Astrophysics Data System (ADS)

    Chen, Zhuojie; She, Didi; Chen, Qinghua; Li, Yanmei; Wu, Wengang

    2018-02-01

    We demonstrate a facile non-catalytic method of fabricating silica nanowires at room temperature. Different polymers including photoresists, parylene C and polystyrene are patterned into pedestals on the silicon substrates. The silica nanowires are obtained via the oxygen plasma treatment on those pedestals. Compared to traditional strategies of silica nanowire fabrication, this method is much simpler and low-cost. Through designing the proper initial patterns and plasma process parameters, the method can be used to fabricate various regiment nano-scale silica structure arrays in any laboratory with a regular oxygen-plasma-based cleaner or reactive-ion-etching equipment.

  8. Evaluation of Low-Pressure Cold Plasma for Disinfection of ISS Grown Produce and Metallic Instrumentation

    NASA Technical Reports Server (NTRS)

    Hintze, Paul E.; Franco, Carolina; Hummerick, Mary E.; Maloney, Phil R.; Spencer, Lashelle E.

    2017-01-01

    Cold plasma (CP) cleaning is a dry, non-thermal process, which can provide broad-spectrum antimicrobial activity yet reportedly causes little to no damage to the object being sanitized. Since cold plasma uses no liquids, it has the distinct advantage when used in microgravity of not having to separate liquids from the item being cleaned. This paper will present results on an effort to use low pressure CP to disinfect or sterilize materials for in space applications. Exposure times from 0 to 60 minutes and pressures ranging from 0.10 to 1.0 mbar were used to optimize plasma parameters. Tests were done on produce and metal coupons to simulate medical equipment. Escherichia coli was used as the challenge organism on produce and Bacillus pumilus SAFR-32 was used on metal surfaces. Produce testing was not successful, with unacceptable kill rates and the produce being negatively impacted by exposure to the plasma. The plasma caused a 5 log reduction in the number of viable bacteria on metal coupon tests, which placed the number of viable bacteria below the detection limit. This is a very promising result showing that sterilization of medical equipment with cold plasma is feasible. Scanning Electron Microscope images were taken before and after exposure. The images after plasma exposure show that the bacteria spores have been physically affected, as their size has gotten smaller and their appearance has changed.

  9. Control technology for integrated circuit fabrication at Micro-Circuit Engineering, Incorporated, West Palm Beach, Florida

    NASA Astrophysics Data System (ADS)

    Mihlan, G. I.; Mitchell, R. I.; Smith, R. K.

    1984-07-01

    A survey to assess control technology for integrated circuit fabrication was conducted. Engineering controls included local and general exhaust ventilation, shielding, and personal protective equipment. Devices or work stations that contained toxic materials that were potentially dangerous were controlled by local exhaust ventilation. Less hazardous areas were controlled by general exhaust ventilation. Process isolation was used in the plasma etching, low pressure chemical vapor deposition, and metallization operations. Shielding was used in ion implantation units to control X-ray emissions, in contact mask alignes to limit ultraviolet (UV) emissions, and in plasma etching units to control radiofrequency and UV emissions. Most operations were automated. Use of personal protective equipment varied by job function.

  10. Plasma Processing with a One Atmosphere Uniform Glow Discharge Plasma (OAUGDP)

    NASA Astrophysics Data System (ADS)

    Reece Roth, J.

    2000-10-01

    The vast majority of all industrial plasma processing is conducted with glow discharges at pressures below 10 torr. This has limited applications to high value workpieces as a result of the large capital cost of vacuum systems and the production constraints of batch processing. It has long been recognized that glow discharges would play a much larger industrial role if they could be operated at one atmosphere. The One Atmosphere Uniform Glow Discharge Plasma (OAUGDP) has been developed at the University of Tennessee Plasma Sciences Laboratory. The OAUGDP is non-thermal RF plasma with the time-resolved characteristics of a classical low pressure DC normal glow discharge. An interdisciplinary team was formed to conduct exploratory investigations of the physics and applications of the OAUGDP. This team includes collaborators from the UTK Textiles and Nonwovens Development Center (TANDEC) and the Departments of Electrical and Computer Engineering, Microbiology, Food Science and Technology, and Mechanical and Aerospace Engineering and Engineering Science. Exploratory tests were conducted on a variety of potential plasma processing and other applications. These include the use of OAUGDP to sterilize medical and dental equipment and air filters; diesel soot removal; plasma aerodynamic effects; electrohydrodynamic (EDH) flow control of the neutral working gas; increasing the surface energy of materials; increasing the wettability and wickability of fabrics; and plasma deposition and directional etching. A general overview of these topics will be presented.

  11. Flexible distributed architecture for semiconductor process control and experimentation

    NASA Astrophysics Data System (ADS)

    Gower, Aaron E.; Boning, Duane S.; McIlrath, Michael B.

    1997-01-01

    Semiconductor fabrication requires an increasingly expensive and integrated set of tightly controlled processes, driving the need for a fabrication facility with fully computerized, networked processing equipment. We describe an integrated, open system architecture enabling distributed experimentation and process control for plasma etching. The system was developed at MIT's Microsystems Technology Laboratories and employs in-situ CCD interferometry based analysis in the sensor-feedback control of an Applied Materials Precision 5000 Plasma Etcher (AME5000). Our system supports accelerated, advanced research involving feedback control algorithms, and includes a distributed interface that utilizes the internet to make these fabrication capabilities available to remote users. The system architecture is both distributed and modular: specific implementation of any one task does not restrict the implementation of another. The low level architectural components include a host controller that communicates with the AME5000 equipment via SECS-II, and a host controller for the acquisition and analysis of the CCD sensor images. A cell controller (CC) manages communications between these equipment and sensor controllers. The CC is also responsible for process control decisions; algorithmic controllers may be integrated locally or via remote communications. Finally, a system server images connections from internet/intranet (web) based clients and uses a direct link with the CC to access the system. Each component communicates via a predefined set of TCP/IP socket based messages. This flexible architecture makes integration easier and more robust, and enables separate software components to run on the same or different computers independent of hardware or software platform.

  12. The Earth's magnetosphere as a sample of the plasma universe

    NASA Technical Reports Server (NTRS)

    Faelthammar, Carl-Gunne

    1986-01-01

    Plasma processes in the Earth's neighborhood determine the environmental conditions under which space-based equipment for science or technology must operate. These processes are peculiar to a state of matter that is rare on Earth but dominates the universe as whole. The physical, and especially the electrodynamic, properties of this state of matter is still far from well understood. By fortunate circumstances, the magnetosphere-ionosphere system of the Earth provides a rich sample of widely different plasma populations, and, even more importantly, it is the site of a remarkable variety of plasma processes. In different combinations such processes must be important throughout the universe, which is overwhelmingly dominated by matter in the plasma state. Therefore, observations and experiments in the near-Earth plasma serve a multitude of purposes. They will not only (1) clarify the dynamics of the space environment but also (2) widen the understanding of matter, (3) form a basis for interpretating remote observations of astrophysical objects, thereby even (4) help to reconstruct events that led to the evolution of the solar system. Last but not least they will (5) provide know-how required for adapting space-based technology to the plasma environment. Such observations and experiments will require a close mutual interplay between science and technology.

  13. Surface thermohardening by the fast-moving electric arch

    NASA Astrophysics Data System (ADS)

    Gabdrakhmanov, Az T.; Shafigullin, L. N.; Galimov, E. R.; Ibragimov, A. R.

    2017-01-01

    This paper describes the technology of modern engineering-plasma hardening steels and prospects of its application. It gives the opportunity to manage the process without using of cooling media, vacuum, special coatings to improve the absorptive capacity of hardened surfaces; the simplicity, the low cost, the maneuverability, a small size of the process equipment; a possibility of the automation and the robotization of technological process.

  14. Argon-oxygen atmospheric pressure plasma treatment on carbon fiber reinforced polymer for improved bonding

    NASA Astrophysics Data System (ADS)

    Chartosias, Marios

    Acceptance of Carbon Fiber Reinforced Polymer (CFRP) structures requires a robust surface preparation method with improved process controls capable of ensuring high bond quality. Surface preparation in a production clean room environment prior to applying adhesive for bonding would minimize risk of contamination and reduce cost. Plasma treatment is a robust surface preparation process capable of being applied in a production clean room environment with process parameters that are easily controlled and documented. Repeatable and consistent processing is enabled through the development of a process parameter window utilizing techniques such as Design of Experiments (DOE) tailored to specific adhesive and substrate bonding applications. Insight from respective plasma treatment Original Equipment Manufacturers (OEMs) and screening tests determined critical process factors from non-factors and set the associated factor levels prior to execution of the DOE. Results from mode I Double Cantilever Beam (DCB) testing per ASTM D 5528 [1] standard and DOE statistical analysis software are used to produce a regression model and determine appropriate optimum settings for each factor.

  15. Cold plasma decontamination of foods.

    PubMed

    Niemira, Brendan A

    2012-01-01

    Cold plasma is a novel nonthermal food processing technology that uses energetic, reactive gases to inactivate contaminating microbes on meats, poultry, fruits, and vegetables. This flexible sanitizing method uses electricity and a carrier gas, such as air, oxygen, nitrogen, or helium; antimicrobial chemical agents are not required. The primary modes of action are due to UV light and reactive chemical products of the cold plasma ionization process. A wide array of cold plasma systems that operate at atmospheric pressures or in low pressure treatment chambers are under development. Reductions of greater than 5 logs can be obtained for pathogens such as Salmonella, Escherichia coli O157:H7, Listeria monocytogenes, and Staphylococcus aureus. Effective treatment times can range from 120 s to as little as 3 s, depending on the food treated and the processing conditions. Key limitations for cold plasma are the relatively early state of technology development, the variety and complexity of the necessary equipment, and the largely unexplored impacts of cold plasma treatment on the sensory and nutritional qualities of treated foods. Also, the antimicrobial modes of action for various cold plasma systems vary depending on the type of cold plasma generated. Optimization and scale up to commercial treatment levels require a more complete understanding of these chemical processes. Nevertheless, this area of technology shows promise and is the subject of active research to enhance efficacy.

  16. Determination of the profit rate of plasma treated production in the food sector

    NASA Astrophysics Data System (ADS)

    Gok, Elif Ceren; Uygun, Emre; Eren, Esin; Oksuz, Lutfi; Uygun Oksuz, Aysegul

    2017-10-01

    Recently, plasma is one of an emerging, green processing technologies used for diverse applications especially food industry. Plasma treatment proposes diverse opportunities in food industry such as surface decontamination, modification of surface properties and improvement in mass transfer with respect for foods and food-related compounds. Sometimes manufacturers use chemical treatment to demolish pathogenic flora, but its capabilities are rather limited. New methods of food sterilization consisting of ionizing radiation, exposure to magnetic fields, high-power ultrasonic treatment are needed expensive equipment or have not yet been developed for industrial use. Plasma could be used for the above mentioned reasons. In this study, the profit rate of plasma treated production in food sector was calculated.

  17. Treatment Characteristics of Second Order Structure of Proteins Using Low-Pressure Oxygen RF Plasma

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Hayashi, Nobuya; Nakahigashi, Akari; Kawaguchi, Ryutaro

    2010-10-13

    Removal of proteins from the surface of medical equipments is attempted using oxygen plasma produced by RF discharge. FTIR spectra indicate that the bonding of C-H and N-H in the casein protein is reduced after irradiation of oxygen plasma. Also, the second order structure of a protein such as {alpha}-helix and {beta}-sheet are modified by the oxygen plasma. Complete removal of casein protein with the concentration of 0.016 mg/cm{sup 2} that is equivalent to remnants on the medical equipment requires two hours avoiding the damage to medical equipments.

  18. The Development of a Ti-6Al-4V Alloy via Oxygen Solid Solution Strengthening for Aerospace and Defense Applications

    DTIC Science & Technology

    2013-03-01

    latter strategy. Mixtures of titanium powders and TiO2 particles were employed as starting materials and consolidated by spark - plasma sintering and...were consolidated in a carbon container installed in the spark - plasma sintering (SPS) equipment under vacuum condition (ɞ Pa) at a temperature of...evaluation of tensile properties of the wrought pure titanium materials consolidated by sintering and hot extrusion process, a theoretical approach using

  19. The Influence of Process Equipment on the Properties of Suspension Plasma Sprayed Yttria-Stabilized Zirconia Coatings

    NASA Astrophysics Data System (ADS)

    Marr, Michael; Waldbillig, David; Kesler, Olivera

    2013-03-01

    Suspension plasma-sprayed YSZ coatings were deposited at lab-scale and production-type facilities to investigate the effect of process equipment on coating properties. The target application for these coatings is solid oxide fuel cell (SOFC) electrolytes; hence, dense microstructures with low permeability values were preferred. Both facilities had the same torch but different suspension feeding systems, torch robots, and substrate holders. The lab-scale facility had higher torch-substrate relative speeds compared with the production-type facility. On porous stainless steel substrates, permeabilities and microstructures were comparable for coatings from both facilities, and no segmentation cracks were observed. Coating permeability was further reduced by increasing substrate temperatures during deposition or reducing suspension feed rates. On SOFC cathode substrates, coatings made in the production-type facility had higher permeabilities and more segmentation cracks compared with coatings made in the lab-scale facility. Increased cracking in coatings from the production-type facility was likely caused mainly by its lower torch-substrate relative speed.

  20. Deep anisotropic ICP plasma etching designed for high-volume MEMS manufacturing

    NASA Astrophysics Data System (ADS)

    Yu, Keven; Feldbaum, Michael; Pandhumsoporn, Tam; Gadgil, Prashant

    1999-08-01

    ICP plasma etching is gaining widespread acceptance as an enabling micromachining technology for advanced MEMS fabrication. Whereas this technology has shown a capability of delivering multiple novel applications for R and D, its acceptance by industry for high volume production has been limited. This acceptance into production will only occur when the plasma etching equipment with this technology offers the device performance, throughput, reliability, and uptime criteria required by a production facility. The design of the plasma etcher using this technology and the process capability it consequently delivers, has significant implications in making this a reality. Alcatel has been supplying such a technology to this MEMS industry for over 5 years and in the interim has evolved its product and process to make this technology production worthy. Alcatel's next generation etcher, the Alcatel 601E, offers multiple advantages to MEMS manufacturers in realizing their production goals.

  1. Evaluation of Low-Pressure Cold Plasma for Disinfection for ISS Grown Produce and Metallic Instrumentation

    NASA Technical Reports Server (NTRS)

    Hintze, Paul E.; Franco, Carolina; Hummerick, Mary E.; Maloney, Phillip R.; Spencer, Lashelle E.

    2017-01-01

    Cold plasma (CP) cleaning is a dry, non-thermal process, which can provide broad-spectrum antimicrobial activity yet reportedly causes little to no damage to the object being sanitized. Since cold plasma uses no liquids, it has the distinct advantage when used in microgravity of not having to separate liquids from the item being cleaned. This paper will present results on an effort to use low pressure CP to disinfect or sterilize materials for in space applications. Exposure times from 0 to 60 minutes and pressures ranging from 10 to 100 Pa were used to optimize plasma parameters to achieve acceptable kill rates for 3 bacteria, Bacillus cereus, E. coli and Bacillus pumulis SAFR-32 and one fungi, Aspergillus niger. These tests were done on produce and metal coupons to simulate medical equipment. Produce testing was not successful, with unacceptable kill rates and the produce being negatively impacted by exposure to the plasma. The plasma caused a 5 log reduction in the number of viable bacteria on metal coupon tests, which placed the number of viable bacteria below the detection limit. This is a very promising result showing that sterilization of medical equipment with cold plasma is feasible. Scanning Electron Microscope images were taken before and after exposure. The images after plasma exposure shows that the bacteria spores have been physically affected, as their size has gotten smaller and the appearance has changed.

  2. Desorption of isopropyl alcohol from adsorbent with non-thermal plasma.

    PubMed

    Shiau, Chen Han; Pan, Kuan Lun; Yu, Sheng Jen; Yan, Shaw Yi; Chang, Moo Been

    2017-09-01

    Effective desorption of isopropyl alcohol (IPA) from adsorbents with non-thermal plasma is developed. In this system, IPA is effectively adsorbed with activated carbon while dielectric barrier discharge is applied to replace the conventional thermal desorption process to achieve good desorption efficiency, making the treatment equipment smaller in size. Various adsorbents including molecular sieves and activated carbon are evaluated for IPA adsorption capacity. The results indicate that BAC has the highest IPA adsorption capacity (280.31 mg IPA/g) under the operating conditions of room temperature, IPA of 400 ppm, and residence time of 0.283 s among 5 adsorbents tested. For the plasma desorption process, the IPA selectivity of 89% is achieved with BAC as N 2 is used as desorbing gas. In addition, as air or O 2 is used as desorbing gas, the IPA desorption concentration is reduced, because air and O 2 plasmas generate active species to oxidize IPA to form acetone, CO 2 , and even CO. Furthermore, the results of the durability test indicate that the amount of IPA desorbed increases with increasing desorption times and plasma desorption process has a higher energy efficiency if compared with thermal desorption. Overall, this study indicates that non-thermal plasma is a viable process for removing VOCs to regenerate adsorbent.

  3. Ion-plasma protective coatings for gas-turbine engine blades

    NASA Astrophysics Data System (ADS)

    Kablov, E. N.; Muboyadzhyan, S. A.; Budinovskii, S. A.; Lutsenko, A. N.

    2007-10-01

    Evaporated, diffusion, and evaporation—diffusion protective and hardening multicomponent ionplasma coatings for turbine and compressor blades and other gas-turbine engine parts are considered. The processes of ion surface treatment (ion etching and ion saturation of a surface in the metallic plasma of a vacuum arc) and commercial equipment for the deposition of coatings and ion surface treatment are analyzed. The specific features of the ion-plasma coatings deposited from the metallic plasma of a vacuum arc are described, and the effect of the ion energy on the phase composition of the coatings and the processes occurring in the surface layer of an article to be treated are discussed. Some properties of ion-plasma coatings designed for various purposes are presented. The ion surface saturation of articles made from structural materials is shown to change the structural and phase states of their surfaces and, correspondingly, the related properties of these materials (i.e., their heat resistance, corrosion resistance, fatigue strength, and so on).

  4. Freeze-drying process monitoring using a cold plasma ionization device.

    PubMed

    Mayeresse, Y; Veillon, R; Sibille, P H; Nomine, C

    2007-01-01

    A cold plasma ionization device has been designed to monitor freeze-drying processes in situ by monitoring lyophilization chamber moisture content. This plasma device, which consists of a probe that can be mounted directly on the lyophilization chamber, depends upon the ionization of nitrogen and water molecules using a radiofrequency generator and spectrometric signal collection. The study performed on this probe shows that it is steam sterilizable, simple to integrate, reproducible, and sensitive. The limitations include suitable positioning in the lyophilization chamber, calibration, and signal integration. Sensitivity was evaluated in relation to the quantity of vials and the probe positioning, and correlation with existing methods, such as microbalance, was established. These tests verified signal reproducibility through three freeze-drying cycles. Scaling-up studies demonstrated a similar product signature for the same product using pilot-scale and larger-scale equipment. On an industrial scale, the method efficiently monitored the freeze-drying cycle, but in a larger industrial freeze-dryer the signal was slightly modified. This was mainly due to the positioning of the plasma device, in relation to the vapor flow pathway, which is not necessarily homogeneous within the freeze-drying chamber. The plasma tool is a relevant method for monitoring freeze-drying processes and may in the future allow the verification of current thermodynamic freeze-drying models. This plasma technique may ultimately represent a process analytical technology (PAT) approach for the freeze-drying process.

  5. Plasma methods for metals recovery from metal-containing waste.

    PubMed

    Changming, Du; Chao, Shang; Gong, Xiangjie; Ting, Wang; Xiange, Wei

    2018-04-27

    Metal-containing waste, a kind of new wastes, has a great potential for recycling and is also difficult to deal with. Many countries pay more and more attention to develop the metal recovery process and equipment of this kind of waste as raw material, so as to solve the environmental pollution and comprehensively utilize the discarded metal resources. Plasma processing is an efficient and environmentally friendly way for metal-containing waste. This review mainly discuss various metal-containing waste types, such as printed circuit boards (PCBs), red mud, galvanic sludge, Zircon, aluminium dross and incinerated ash, and the corresponding plasma methods, which include DC extended transferred arc plasma reactor, DC non-transferred arc plasma torch, RF thermal plasma reactor and argon and argon-hydrogen plasma jets. In addition, the plasma arc melting technology has a better purification effect on the extraction of useful metals from metal-containing wastes, a great capacity of volume reduction of waste materials, and a low leaching toxicity of solid slag, which can also be used to deal with all kinds of metal waste materials, having a wide range of applications. Copyright © 2018 Elsevier Ltd. All rights reserved.

  6. Non-thermal plasma technologies: new tools for bio-decontamination.

    PubMed

    Moreau, M; Orange, N; Feuilloley, M G J

    2008-01-01

    Bacterial control and decontamination are crucial to industrial safety assessments. However, most recently developed materials are not compatible with standard heat sterilization treatments. Advanced oxidation processes, and particularly non-thermal plasmas, are emerging and promising technologies for sanitation because they are both efficient and cheap. The applications of non-thermal plasma to bacterial control remain poorly known for several reasons: this technique was not developed for biological applications and most of the literature is in the fields of physics and chemistry. Moreover, the diversity of the devices and complexity of the plasmas made any general evaluation of the potential of the technique difficult. Finally, no experimental equipment for non-thermal plasma sterilization is commercially available and reference articles for microbiologists are rare. The present review aims to give an overview of the principles of action and applications of plasma technologies in biodecontamination.

  7. Hydrogen Plasma Processing of Iron Ore

    NASA Astrophysics Data System (ADS)

    Sabat, Kali Charan; Murphy, Anthony B.

    2017-06-01

    Iron is currently produced by carbothermic reduction of oxide ores. This is a multiple-stage process that requires large-scale equipment and high capital investment, and produces large amounts of CO2. An alternative to carbothermic reduction is reduction using a hydrogen plasma, which comprises vibrationally excited molecular, atomic, and ionic states of hydrogen, all of which can reduce iron oxides, even at low temperatures. Besides the thermodynamic and kinetic advantages of a hydrogen plasma, the byproduct of the reaction is water, which does not pose any environmental problems. A review of the theory and practice of iron ore reduction using a hydrogen plasma is presented. The thermodynamic and kinetic aspects are considered, with molecular, atomic and ionic hydrogen considered separately. The importance of vibrationally excited hydrogen molecules in overcoming the activation energy barriers, and in transferring energy to the iron oxide, is emphasized. Both thermal and nonthermal plasmas are considered. The thermophysical properties of hydrogen and argon-hydrogen plasmas are discussed, and their influence on the constriction and flow in the of arc plasmas is considered. The published R&D on hydrogen plasma reduction of iron oxide is reviewed, with both the reduction of molten iron ore and in-flight reduction of iron ore particles being considered. Finally, the technical and economic feasibility of the process are discussed. It is shown that hydrogen plasma processing requires less energy than carbothermic reduction, mainly because pelletization, sintering, and cokemaking are not required. Moreover, the formation of the greenhouse gas CO2 as a byproduct is avoided. In-flight reduction has the potential for a throughput at least equivalent to the blast furnace process. It is concluded that hydrogen plasma reduction of iron ore is a potentially attractive alternative to standard methods.

  8. Conceptual design of Dipole Research Experiment (DREX)

    NASA Astrophysics Data System (ADS)

    Xiao, Qingmei; Wang, Zhibin; Wang, Xiaogang; Xiao, Chijie; Yang, Xiaoyi; Zheng, Jinxing

    2017-03-01

    A new terrella-like device for laboratory simulation of inner magnetosphere plasmas, Dipole Research Experiment, is scheduled to be built at the Harbin Institute of Technology (HIT), China, as a major state scientific research facility for space physics studies. It is designed to provide a ground experimental platform to reproduce the inner magnetosphere to simulate the processes of trapping, acceleration, and transport of energetic charged particles restrained in a dipole magnetic field configuration. The scaling relation of hydromagnetism between the laboratory plasma of the device and the geomagnetosphere plasma is applied to resemble geospace processes in the Dipole Research Experiment plasma. Multiple plasma sources, different kinds of coils with specific functions, and advanced diagnostics are designed to be equipped in the facility for multi-functions. The motivation, design criteria for the Dipole Research Experiment experiments and the means applied to generate the plasma of desired parameters in the laboratory are also described. Supported by National Natural Science Foundation of China (Nos. 11505040, 11261140326 and 11405038), China Postdoctoral Science Foundation (Nos. 2016M591518, 2015M570283) and Project Supported by Natural Scientific Research Innovation Foundation in Harbin Institute of Technology (No. 2017008).

  9. Development and evaluation of magnesium oxide-based ceramics for chamber parts in mass-production plasma etching equipment

    NASA Astrophysics Data System (ADS)

    Kasashima, Yuji; Tsutsumi, Kota; Mitomi, Shinzo; Uesugi, Fumihiko

    2017-06-01

    In mass-production plasma etching equipment, the corrosion of ceramic chamber parts reduces the production yield of LSI and overall equipment effectiveness (OEE) owing to contamination, short useful life, and particle generation. Novel ceramics that can improve the production yield and OEE are highly required. We develop magnesium oxide (MgO)-based ceramics and evaluate them under mass-production plasma etching conditions. The results of this study indicate that the developed MgO-based ceramics with high mechanical properties and low electric resistivity have a higher resistance to corrosion in plasma etching using CF4 gas than Si and conventional ceramic materials such as aluminum oxide and yttrium oxide.

  10. Method and Process Development of Advanced Atmospheric Plasma Spraying for Thermal Barrier Coatings

    NASA Astrophysics Data System (ADS)

    Mihm, Sebastian; Duda, Thomas; Gruner, Heiko; Thomas, Georg; Dzur, Birger

    2012-06-01

    Over the last few years, global economic growth has triggered a dramatic increase in the demand for resources, resulting in steady rise in prices for energy and raw materials. In the gas turbine manufacturing sector, process optimizations of cost-intensive production steps involve a heightened potential of savings and form the basis for securing future competitive advantages in the market. In this context, the atmospheric plasma spraying (APS) process for thermal barrier coatings (TBC) has been optimized. A constraint for the optimization of the APS coating process is the use of the existing coating equipment. Furthermore, the current coating quality and characteristics must not change so as to avoid new qualification and testing. Using experience in APS and empirically gained data, the process optimization plan included the variation of e.g. the plasma gas composition and flow-rate, the electrical power, the arrangement and angle of the powder injectors in relation to the plasma jet, the grain size distribution of the spray powder and the plasma torch movement procedures such as spray distance, offset and iteration. In particular, plasma properties (enthalpy, velocity and temperature), powder injection conditions (injection point, injection speed, grain size and distribution) and the coating lamination (coating pattern and spraying distance) are examined. The optimized process and resulting coating were compared to the current situation using several diagnostic methods. The improved process significantly reduces costs and achieves the requirement of comparable coating quality. Furthermore, a contribution was made towards better comprehension of the APS of ceramics and the definition of a better method for future process developments.

  11. Plasma surface figuring of large optical components

    NASA Astrophysics Data System (ADS)

    Jourdain, R.; Castelli, M.; Morantz, P.; Shore, P.

    2012-04-01

    Fast figuring of large optical components is well known as a highly challenging manufacturing issue. Different manufacturing technologies including: magnetorheological finishing, loose abrasive polishing, ion beam figuring are presently employed. Yet, these technologies are slow and lead to expensive optics. This explains why plasma-based processes operating at atmospheric pressure have been researched as a cost effective means for figure correction of metre scale optical surfaces. In this paper, fast figure correction of a large optical surface is reported using the Reactive Atom Plasma (RAP) process. Achievements are shown following the scaling-up of the RAP figuring process to a 400 mm diameter area of a substrate made of Corning ULE®. The pre-processing spherical surface is characterized by a 3 metres radius of curvature, 2.3 μm PVr (373nm RMS), and 1.2 nm Sq nanometre roughness. The nanometre scale correction figuring system used for this research work is named the HELIOS 1200, and it is equipped with a unique plasma torch which is driven by a dedicated tool path algorithm. Topography map measurements were carried out using a vertical work station instrumented by a Zygo DynaFiz interferometer. Figuring results, together with the processing times, convergence levels and number of iterations, are reported. The results illustrate the significant potential and advantage of plasma processing for figuring correction of large silicon based optical components.

  12. DOE Office of Scientific and Technical Information (OSTI.GOV)

    Goto, Tetsuya; Matsuoka, Takaaki; Ohmi, Tadahiro

    Novel magnetron-sputtering equipment, called rotation magnet sputtering (ROT-MS), was developed to overcome various disadvantages of current magnetron-sputtering equipment. Disadvantages include (1) very low target utilization of less than 20%, (2) difficulty in obtaining uniform deposition on the substrate, and (3) charge-up damages and ion-bombardment-induced damages resulting from very high electron temperature (>3 eV) and that the substrate is set at the plasma excitation region. In ROT-MS, a number of moving high-density plasma loops are excited on the target surface by rotating helical magnets, resulting in very high target utilization with uniform target erosion and uniform deposition on the substrate. Thismore » excellent performance can be principally maintained even if equipment size increases for very large-substrate deposition. Because strong horizontal magnetic fields (>0.05 T) are produced within a very limited region just at the target surface, very low electron-temperature plasmas (<2.5 eV for Ar plasma and <1 eV for direct-current-excited Xe plasma) are excited at the very limited region adjacent to the target surface with a combination of grounded plate closely mounted on the strong magnetic field region. Consequently, the authors can establish charge-up damage-free and ion-bombardment-induced damage-free processes. ROT-MS has been applied for thin-film formation of LaB{sub 6}, which is well known as a stable, low-work-function bulk-crystal material for electron emissions. The work function of the LaB{sub 6} film decreased to 2.8 eV due to enhanced (100)-orientation crystallinity and reduced resistivity realized by adjusting the flux of low-energy bombarding ions impinging on the depositing surface, which work very efficiently, improving the performance of the electron emission devices.« less

  13. High density circuit technology, part 3

    NASA Technical Reports Server (NTRS)

    Wade, T. E.

    1982-01-01

    Dry processing - both etching and deposition - and present/future trends in semiconductor technology are discussed. In addition to a description of the basic apparatus, terminology, advantages, glow discharge phenomena, gas-surface chemistries, and key operational parameters for both dry etching and plasma deposition processes, a comprehensive survey of dry processing equipment (via vendor listing) is also included. The following topics are also discussed: fine-line photolithography, low-temperature processing, packaging for dense VLSI die, the role of integrated optics, and VLSI and technology innovations.

  14. Analysis of flow field characteristics in IC equipment chamber based on orthogonal design

    NASA Astrophysics Data System (ADS)

    Liu, W. F.; Yang, Y. Y.; Wang, C. N.

    2017-01-01

    This paper aims to study the influence of the configuration of processing chamber as a part of IC equipment on flow field characteristics. Four parameters, including chamber height, chamber diameter, inlet mass flow rate and outlet area, are arranged using orthogonally design method to study their influence on flow distribution in the processing chamber with the commercial software-Fluent. The velocity, pressure and temperature distribution above the holder were analysed respectively. The velocity difference value of the gas flow above the holder is defined as the evaluation criteria to evaluate the uniformity of the gas flow. The quantitative relationship between key parameters and the uniformity of gas flow was found through analysis of experimental results. According to our study, the chamber height is the most significant factor, and then follows the outlet area, chamber diameter and inlet mass flow rate. This research can provide insights into the study and design of configuration of etcher, plasma enhanced chemical vapor deposition (PECVD) equipment, and other systems with similar configuration and processing condition.

  15. Glow-to-arc transition events in H2-Ar direct current pulsed plasma: automated measurement of current and voltage.

    PubMed

    Mendes, Luciano A; Mafra, Márcio; Rodrigues, Jhonatam C

    2012-01-01

    The glow-to-arc transition phenomena (arcing) observed in plasma reactors used in materials processing was studied through the arcs characteristic current and voltage waveforms. In order to capture these arcs signals, a LABVIEW™ based automated instrumentation system (ARCVIEW) was developed, including the integration of an oscilloscope equipped with proper current and voltage probes. The system also allows capturing the process parameters at the arc occurrence moments, which were used to map the arcs events conditions. Experiments in H(2)-Ar DC pulsed plasma returned signals data from 215 arcs events, which were analyzed through software routines. According to the results, an anti-arcing system should react in the time order of few microseconds to prevent most of the damage caused by the undesired arcing phenomena.

  16. Hydrogen recovery from the thermal plasma gasification of solid waste.

    PubMed

    Byun, Youngchul; Cho, Moohyun; Chung, Jae Woo; Namkung, Won; Lee, Hyeon Don; Jang, Sung Duk; Kim, Young-Suk; Lee, Jin-Ho; Lee, Carg-Ro; Hwang, Soon-Mo

    2011-06-15

    Thermal plasma gasification has been demonstrated as one of the most effective and environmentally friendly methods for solid waste treatment and energy utilization in many of studies. Therefore, the thermal plasma process of solid waste gasification (paper mill waste, 1.2 ton/day) was applied for the recovery of high purity H(2) (>99.99%). Gases emitted from a gasification furnace equipped with a nontransferred thermal plasma torch were purified using a bag-filter and wet scrubber. Thereafter, the gases, which contained syngas (CO+H(2)), were introduced into a H(2) recovery system, consisting largely of a water gas shift (WGS) unit for the conversion of CO to H(2) and a pressure swing adsorption (PSA) unit for the separation and purification of H(2). It was successfully demonstrated that the thermal plasma process of solid waste gasification, combined with the WGS and PSA, produced high purity H(2) (20 N m(3)/h (400 H(2)-Nm(3)/PMW-ton), up to 99.99%) using a plasma torch with 1.6 MWh/PMW-ton of electricity. The results presented here suggest that the thermal plasma process of solid waste gasification for the production of high purity H(2) may provide a new approach as a future energy infrastructure based on H(2). Copyright © 2011 Elsevier B.V. All rights reserved.

  17. Evolution processes of the corrosion behavior and structural characteristics of plasma electrolytic oxidation coatings on AZ31 magnesium alloy

    NASA Astrophysics Data System (ADS)

    Chen, Dong; Wang, Ruiqiang; Huang, Zhiquan; Wu, Yekang; Zhang, Yi; Wu, Guorui; Li, Dalong; Guo, Changhong; Jiang, Guirong; Yu, Shengxue; Shen, Dejiu; Nash, Philip

    2018-03-01

    Evolution processes of the corrosion behavior and structural characteristics of the plasma electrolytic oxidation (PEO) coated AZ31 magnesium alloy were investigated by using scanning electron microscope (SEM) equipped with energy dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), potentio-dynamic polarization curves and electrochemical impedance spectroscopy (EIS) measurements. Detached coating samples were fabricated by an electrochemical method and more details of the internal micro-structure of coatings were clearly observed on the fractured cross-section morphologies of the samples compared to general polished cross-section morphologies. Evolution mechanisms of the coating corrosion behavior in relation to the evolution of micro-structural characteristics were discussed in detail.

  18. Surface hardening of cutting elements agricultural machinery vibro arc plasma

    NASA Astrophysics Data System (ADS)

    Sharifullin, S. N.; Adigamov, N. R.; Adigamov, N. N.; Solovev, R. Y.; Arakcheeva, K. S.

    2016-01-01

    At present, the state technical policy aimed at the modernization of worn equipment, including agriculture, based on the use of high-performance technology called nanotechnology. By upgrading worn-out equipment meant restoring it with the achievement of the above parameters passport. The existing traditional technologies are not suitable for the repair of worn-out equipment modernization. This is especially true of imported equipment. Out here alone - is the use of high-performance technologies. In this paper, we consider the use of vibro arc plasma for surface hardening of cutting elements of agricultural machinery.

  19. Advances and directions of ion nitriding/carburizing

    NASA Technical Reports Server (NTRS)

    Spalvins, Talivaldis

    1989-01-01

    Ion nitriding and carburizing are plasma activated thermodynamic processes for the production of case hardened surface layers not only for ferrous materials, but also for an increasing number of nonferrous metals. When the treatment variables are properly controlled, the use of nitrogenous or carbonaceous glow discharge medium offers great flexibility in tailoring surface/near-surface properties independently of the bulk properties. The ion nitriding process has reached a high level of maturity and has gained wide industrial acceptance, while the more recently introduced ion carburizing process is rapidly gaining industrial acceptance. The current status of plasma mass transfer mechanisms into the surface regarding the formation of compound and diffusion layers in ion nitriding and carbon build-up ion carburizing is reviewed. In addition, the recent developments in design and construction of advanced equipment for obtaining optimized and controlled case/core properties is summarized. Also, new developments and trends such as duplex plasma treatments and alternatives to dc diode nitriding are highlighted.

  20. Application of electron beam equipment based on a plasma cathode gun in additive technology

    NASA Astrophysics Data System (ADS)

    Galchenko, N. K.; Kolesnikova, K. A.; Semenov, G. V.; Rau, A. G.; Raskoshniy, S. Y.; Bezzubko, A. V.; Dampilon, B. V.; Sorokova, S. N.

    2016-11-01

    The paper discusses the application of electron beam equipment based on a plasma cathode gun for three-dimensional surface modification of metals and alloys. The effect of substrate surface preparation on the adhesion strength of gas thermal coatings has been investigated.

  1. Plasma Torch for Plasma Ignition and Combustion of Coal

    NASA Astrophysics Data System (ADS)

    Ustimenko, Alexandr; Messerle, Vladimir

    2015-09-01

    Plasma-fuel systems (PFS) have been developed to improve coal combustion efficiency. PFS is a pulverized coal burner equipped with arc plasma torch producing high temperature air stream of 4000 - 6000 K. Plasma activation of coal at the PFS increases the coal reactivity and provides more effective ignition and ecologically friendly incineration of low-rank coal. The main and crucial element of PFS is plasma torch. Simplicity and reliability of the industrial arc plasma torches using cylindrical copper cathode and air as plasma forming gas predestined their application at heat and power engineering for plasma aided coal combustion. Life time of these plasma torches electrodes is critical and usually limited to 200 hours. Considered in this report direct current arc plasma torch has the cathode life significantly exceeded 1000 hours. To ensure the electrodes long life the process of hydrocarbon gas dissociation in the electric arc discharge is used. In accordance to this method atoms and ions of carbon from near-electrode plasma deposit on the active surface of the electrodes and form electrode carbon condensate which operates as ``actual'' electrode. Complex physicochemical investigation showed that deposit consists of nanocarbon material.

  2. Plasma deposition of silver nanoparticles on ultrafiltration membranes: antibacterial and anti-biofouling properties.

    PubMed

    Cruz, Mercedes Cecilia; Ruano, Gustavo; Wolf, Marcus; Hecker, Dominic; Vidaurre, Elza Castro; Schmittgens, Ralph; Rajal, Verónica Beatriz

    2015-02-01

    A novel and versatile plasma reactor was used to modify Polyethersulphone commercial membranes. The equipment was applied to: i) functionalize the membranes with low-temperature plasmas, ii) deposit a film of poly(methyl methacrylate) (PMMA) by Plasma Enhanced Chemical Vapor Deposition (PECVD) and, iii) deposit silver nanoparticles (SNP) by Gas Flow Sputtering. Each modification process was performed in the same reactor consecutively, without exposure of the membranes to atmospheric air. Scanning electron microscopy and transmission electron microscopy were used to characterize the particles and modified membranes. SNP are evenly distributed on the membrane surface. Particle fixation and transport inside membranes were assessed before- and after-washing assays by X-ray photoelectron spectroscopy depth profiling analysis. PMMA addition improved SNP fixation. Plasma-treated membranes showed higher hydrophilicity. Anti-biofouling activity was successfully achieved against Gram-positive ( Enterococcus faecalis ) and -negative ( Salmonella Typhimurium) bacteria. Therefore, disinfection by ultrafiltration showed substantial resistance to biofouling. The post-synthesis functionalization process developed provides a more efficient fabrication route for anti-biofouling and anti-bacterial membranes used in the water treatment field. To the best of our knowledge, this is the first report of a gas phase condensation process combined with a PECVD procedure in order to deposit SNP on commercial membranes to inhibit biofouling formation.

  3. Plasma deposition of silver nanoparticles on ultrafiltration membranes: antibacterial and anti-biofouling properties

    PubMed Central

    Cruz, Mercedes Cecilia; Ruano, Gustavo; Wolf, Marcus; Hecker, Dominic; Vidaurre, Elza Castro; Schmittgens, Ralph; Rajal, Verónica Beatriz

    2015-01-01

    A novel and versatile plasma reactor was used to modify Polyethersulphone commercial membranes. The equipment was applied to: i) functionalize the membranes with low-temperature plasmas, ii) deposit a film of poly(methyl methacrylate) (PMMA) by Plasma Enhanced Chemical Vapor Deposition (PECVD) and, iii) deposit silver nanoparticles (SNP) by Gas Flow Sputtering. Each modification process was performed in the same reactor consecutively, without exposure of the membranes to atmospheric air. Scanning electron microscopy and transmission electron microscopy were used to characterize the particles and modified membranes. SNP are evenly distributed on the membrane surface. Particle fixation and transport inside membranes were assessed before- and after-washing assays by X-ray photoelectron spectroscopy depth profiling analysis. PMMA addition improved SNP fixation. Plasma-treated membranes showed higher hydrophilicity. Anti-biofouling activity was successfully achieved against Gram-positive (Enterococcus faecalis) and -negative (Salmonella Typhimurium) bacteria. Therefore, disinfection by ultrafiltration showed substantial resistance to biofouling. The post-synthesis functionalization process developed provides a more efficient fabrication route for anti-biofouling and anti-bacterial membranes used in the water treatment field. To the best of our knowledge, this is the first report of a gas phase condensation process combined with a PECVD procedure in order to deposit SNP on commercial membranes to inhibit biofouling formation. PMID:26166926

  4. The interaction of spacecraft high voltage power systems with the space plasma environment

    NASA Technical Reports Server (NTRS)

    Domitz, S.; Grier, N. T.

    1974-01-01

    Research work has shown that the interaction of a spacecraft and its high voltage power systems with the space plasma environment can result in harmful power loss and damage to insulators and metal surfaces. Insulator and solar panel tests were performed and flight tests are planned. High voltage power processing equipment was shown to be affected by power loss, and by transients due to plasma interactions. Power loss was determined to be roughly proportional to the square of the voltage and increases approximately as the square root of the area. Kapton, Teflon, and glass were found to be satisfactory insulating materials and it is concluded that for large space power stations should consider the effect of large pinhole currents.

  5. High-density plasma deposition manufacturing productivity improvement

    NASA Astrophysics Data System (ADS)

    Olmer, Leonard J.; Hudson, Chris P.

    1999-09-01

    High Density Plasma (HDP) deposition provides a means to deposit high quality dielectrics meeting submicron gap fill requirements. But, compared to traditional PECVD processing, HDP is relatively expensive due to the higher capital cost of the equipment. In order to keep processing costs low, it became necessary to maximize the wafer throughput of HDP processing without degrading the film properties. The approach taken was to optimize the post deposition microwave in-situ clean efficiency. A regression model, based on actual data, indicated that number of wafers processed before a chamber clean was the dominant factor. Furthermore, a design change in the ceramic hardware, surrounding the electrostatic chuck, provided thermal isolation resulting in an enhanced clean rate of the chamber process kit. An infra-red detector located in the chamber exhaust line provided a means to endpoint the clean and in-film particle data confirmed the infra-red results. The combination of increased chamber clean frequency, optimized clean time and improved process.

  6. Automated Welding System

    NASA Technical Reports Server (NTRS)

    Bayless, E. O.; Lawless, K. G.; Kurgan, C.; Nunes, A. C.; Graham, B. F.; Hoffman, D.; Jones, C. S.; Shepard, R.

    1993-01-01

    Fully automated variable-polarity plasma arc VPPA welding system developed at Marshall Space Flight Center. System eliminates defects caused by human error. Integrates many sensors with mathematical model of the weld and computer-controlled welding equipment. Sensors provide real-time information on geometry of weld bead, location of weld joint, and wire-feed entry. Mathematical model relates geometry of weld to critical parameters of welding process.

  7. Research on Nitride Thin Films, Advanced Plasma Diagnostics, and Charged-Particle Processes

    DTIC Science & Technology

    2006-07-01

    Additionally, these components are being placed closer to the point of use--requiring that they operate in extreme temperature environments ...reasons for component failure. To operate in extreme temperature environments , electronic and electrical components must withstand higher ambient...hybrid and plug-in hybrid-powered automobiles, heart defibrillators , and industrial equipment will benefit from a new generation of capacitors. High

  8. Soluble Proteins Form Film by the Treatment of Low Temperature Plasma

    NASA Astrophysics Data System (ADS)

    Ikehara, Sanae; Sakakita, Hajime; Ishikawa, Kenji; Akimoto, Yoshihiro; Nakanishi, Hayao; Shimizu, Nobuyuki; Hori, Masaru; Ikehara, Yuzuru

    2015-09-01

    It has been pointed out that low temperature plasma in atmosphere was feasible to use for hemostasis without heat injury. Indeed, earlier studies demonstrated that low temperature plasma played an important role to stimulate platelets to aggregate and turned on the proteolytic activities of coagulation factors, resulting in the acceleration of the natural blood coagulation process. On the other hands, our developed equips could immediately form clots upon the contact with plasma flair, while the histological appearance was different from natural coagulation. Based on these findings in formed clots, we sought to determine if plasma flair supplied by our devices was capable of forming film using a series of soluble proteins Following plasma treatment, films were formed from bovine serum albumin, and the other plasma proteins at physiological concentration. Analysis of trans-electron microscope demonstrated that plasma treatment generated small protein particles and made them fuse to be larger aggregations The combined results demonstrated that plasma are capable of aggregating soluble proteins and that platelets and coagulation factors are not necessary for plasma induced blood coagulation. Supported in part by Grants-in-Aid for Scientific Research on Priority Area (21590454, 24590498, and 24108006 to Y. I.).

  9. New methodology to baseline and match AME polysilicon etcher using advanced diagnostic tools

    NASA Astrophysics Data System (ADS)

    Poppe, James; Shipman, John; Reinhardt, Barbara E.; Roussel, Myriam; Hedgecock, Raymond; Fonda, Arturo

    1999-09-01

    As process controls tighten in the semiconductor industry, the need to understand the variables that determine system performance become more important. For plasma etch systems, process success depends on the control of key parameters such as: vacuum integrity, pressure, gas flows, and RF power. It is imperative to baseline, monitor, and control these variables. This paper presents an overview of the methods and tools used by Motorola BMC fabrication facility to characterize an Applied Materials polysilicon etcher. Tool performance data obtained from our traditional measurement techniques are limited in their scope and do not provide a complete picture of the ultimate tool performance. Presently the BMC traditional characterization tools provide a snapshot of the static operation of the equipment under test (EUT); however, complete evaluation of the dynamic performance cannot be monitored without the aid of specialized diagnostic equipment. To provide us with a complete system baseline evaluation of the polysilicon etcher, three diagnostic tools were utilized: Lucas Labs Vacuum Diagnostic System, Residual Gas Analyzer, and the ENI Voltage/Impedance Probe. The diagnostic methodology used to baseline and match key parameters of qualified production equipment has had an immense impact on other equipment characterization in the facility. It has resulted in reduced cycle time for new equipment introduction as well.

  10. Scalable graphene production: perspectives and challenges of plasma applications

    NASA Astrophysics Data System (ADS)

    Levchenko, Igor; Ostrikov, Kostya (Ken); Zheng, Jie; Li, Xingguo; Keidar, Michael; B. K. Teo, Kenneth

    2016-05-01

    Graphene, a newly discovered and extensively investigated material, has many unique and extraordinary properties which promise major technological advances in fields ranging from electronics to mechanical engineering and food production. Unfortunately, complex techniques and high production costs hinder commonplace applications. Scaling of existing graphene production techniques to the industrial level without compromising its properties is a current challenge. This article focuses on the perspectives and challenges of scalability, equipment, and technological perspectives of the plasma-based techniques which offer many unique possibilities for the synthesis of graphene and graphene-containing products. The plasma-based processes are amenable for scaling and could also be useful to enhance the controllability of the conventional chemical vapour deposition method and some other techniques, and to ensure a good quality of the produced graphene. We examine the unique features of the plasma-enhanced graphene production approaches, including the techniques based on inductively-coupled and arc discharges, in the context of their potential scaling to mass production following the generic scaling approaches applicable to the existing processes and systems. This work analyses a large amount of the recent literature on graphene production by various techniques and summarizes the results in a tabular form to provide a simple and convenient comparison of several available techniques. Our analysis reveals a significant potential of scalability for plasma-based technologies, based on the scaling-related process characteristics. Among other processes, a greater yield of 1 g × h-1 m-2 was reached for the arc discharge technology, whereas the other plasma-based techniques show process yields comparable to the neutral-gas based methods. Selected plasma-based techniques show lower energy consumption than in thermal CVD processes, and the ability to produce graphene flakes of various sizes reaching hundreds of square millimetres, and the thickness varying from a monolayer to 10-20 layers. Additional factors such as electrical voltage and current, not available in thermal CVD processes could potentially lead to better scalability, flexibility and control of the plasma-based processes. Advantages and disadvantages of various systems are also considered.

  11. Scalable graphene production: perspectives and challenges of plasma applications.

    PubMed

    Levchenko, Igor; Ostrikov, Kostya Ken; Zheng, Jie; Li, Xingguo; Keidar, Michael; B K Teo, Kenneth

    2016-05-19

    Graphene, a newly discovered and extensively investigated material, has many unique and extraordinary properties which promise major technological advances in fields ranging from electronics to mechanical engineering and food production. Unfortunately, complex techniques and high production costs hinder commonplace applications. Scaling of existing graphene production techniques to the industrial level without compromising its properties is a current challenge. This article focuses on the perspectives and challenges of scalability, equipment, and technological perspectives of the plasma-based techniques which offer many unique possibilities for the synthesis of graphene and graphene-containing products. The plasma-based processes are amenable for scaling and could also be useful to enhance the controllability of the conventional chemical vapour deposition method and some other techniques, and to ensure a good quality of the produced graphene. We examine the unique features of the plasma-enhanced graphene production approaches, including the techniques based on inductively-coupled and arc discharges, in the context of their potential scaling to mass production following the generic scaling approaches applicable to the existing processes and systems. This work analyses a large amount of the recent literature on graphene production by various techniques and summarizes the results in a tabular form to provide a simple and convenient comparison of several available techniques. Our analysis reveals a significant potential of scalability for plasma-based technologies, based on the scaling-related process characteristics. Among other processes, a greater yield of 1 g × h(-1) m(-2) was reached for the arc discharge technology, whereas the other plasma-based techniques show process yields comparable to the neutral-gas based methods. Selected plasma-based techniques show lower energy consumption than in thermal CVD processes, and the ability to produce graphene flakes of various sizes reaching hundreds of square millimetres, and the thickness varying from a monolayer to 10-20 layers. Additional factors such as electrical voltage and current, not available in thermal CVD processes could potentially lead to better scalability, flexibility and control of the plasma-based processes. Advantages and disadvantages of various systems are also considered.

  12. Plasma functionalization of powdery nanomaterials using porous filter electrode and sample circulation

    NASA Astrophysics Data System (ADS)

    Lee, Deuk Yeon; Choi, Jae Hong; Shin, Jung Chul; Jung, Man Ki; Song, Seok Kyun; Suh, Jung Ki; Lee, Chang Young

    2018-06-01

    Compared with wet processes, dry functionalization using plasma is fast, scalable, solvent-free, and thus presents a promising approach for grafting functional groups to powdery nanomaterials. Previous approaches, however, had difficulties in maintaining an intimate sample-plasma contact and achieving uniform functionalization. Here, we demonstrate a plasma reactor equipped with a porous filter electrode that increases both homogeneity and degree of functionalization by capturing and circulating powdery carbon nanotubes (CNTs) via vacuum and gas blowing. Spectroscopic measurements verify that treatment with O2/air plasma generates oxygen-containing groups on the surface of CNTs, with the degree of functionalization readily controlled by varying the circulation number. Gas sensors fabricated using the plasma-treated CNTs confirm alteration of molecular adsorption on the surface of CNTs. A sequential treatment with NH3 plasma following the oxidation pre-treatment results in the functionalization with nitrogen species of up to 3.2 wt%. Our approach requiring no organic solvents not only is cost-effective and environmentally friendly, but also serves as a versatile tool that applies to other powdery micro or nanoscale materials for controlled modification of their surfaces.

  13. Radio Frequency Plasma Synthesis of Boron Nitride Nanotubes (BNNTs) for Structural Applications. Part II

    NASA Technical Reports Server (NTRS)

    Hales, Stephen J.; Alexa, Joel A.; Jensen, Brian J.

    2016-01-01

    Boron nitride nanotubes (BNNTs) are more thermally and chemically compatible with metal- and ceramic-matrix composites than carbon nanotubes (CNTs). The lack of an abundant supply of defect-free, high-aspect-ratio BNNTs has hindered development as reinforcing agents in structural materials. Recent activities at the National Research Council - Canada (NRC-C) and the University of California - Berkeley (UC-B) have resulted in bulk synthesis of few-walled, small diameter BNNTs. Both processes employ induction plasma technology to create boron vapor and highly reactive nitrogen species at temperatures in excess of 8000 K. Subsequent recombination under controlled cooling conditions results in the formation of BNNTs at a rate of 20 g/hr and 35 g/hr, respectively. The end product tends to consist of tangled masses of fibril-, sheet-, and cotton candy-like materials, which accumulate within the processing equipment. The radio frequency plasma spray (RFPS) facility at NASA Langley (LaRC), developed for metallic materials deposition, has been re-tooled for in-situ synthesis of BNNTs. The NRC-C and UC-B facilities comprise a 60 kW RF torch, a reactor with a stove pipe geometry, and a filtration system. In contrast, the LaRC facility has a 100 kW torch mounted atop an expansive reaction chamber coupled with a cyclone separator. The intent is to take advantage of both the extra power and the equipment configuration to simultaneously produce and gather BNNTs in a macroscopic form amenable to structural material applications.

  14. Chlorine-rich plasma polymer coating for the prevention of attachment of pathogenic fungal cells onto materials surfaces

    NASA Astrophysics Data System (ADS)

    Lamont-Friedrich, Stephanie J.; Michl, Thomas D.; Giles, Carla; Griesser, Hans J.; Coad, Bryan R.

    2016-07-01

    The attachment of pathogenic fungal cells onto materials surfaces, which is often followed by biofilm formation, causes adverse consequences in a wide range of areas. Here we have investigated the ability of thin film coatings from chlorinated molecules to deter fungal colonization of solid materials by contact killing of fungal cells reaching the surface of the coating. Coatings were deposited onto various substrate materials via plasma polymerization, which is a substrate-independent process widely used for industrial coating applications, using 1,1,2-trichloroethane as the process vapour. XPS surface analysis showed that the coatings were characterized by a highly chlorinated hydrocarbon polymer nature, with only a very small amount of oxygen incorporated. The activity of these coatings against human fungal pathogens was quantified using a recently developed, modified yeast assay and excellent antifungal activity was observed against Candida albicans and Candida glabrata. Plasma polymer surface coatings derived from chlorinated hydrocarbon molecules may therefore offer a promising solution to preventing yeast and mould biofilm formation on materials surfaces, for applications such as air conditioners, biomedical devices, food processing equipment, and others.

  15. Automated processing of whole blood units: operational value and in vitro quality of final blood components

    PubMed Central

    Jurado, Marisa; Algora, Manuel; Garcia-Sanchez, Félix; Vico, Santiago; Rodriguez, Eva; Perez, Sonia; Barbolla, Luz

    2012-01-01

    Background The Community Transfusion Centre in Madrid currently processes whole blood using a conventional procedure (Compomat, Fresenius) followed by automated processing of buffy coats with the OrbiSac system (CaridianBCT). The Atreus 3C system (CaridianBCT) automates the production of red blood cells, plasma and an interim platelet unit from a whole blood unit. Interim platelet unit are pooled to produce a transfusable platelet unit. In this study the Atreus 3C system was evaluated and compared to the routine method with regards to product quality and operational value. Materials and methods Over a 5-week period 810 whole blood units were processed using the Atreus 3C system. The attributes of the automated process were compared to those of the routine method by assessing productivity, space, equipment and staffing requirements. The data obtained were evaluated in order to estimate the impact of implementing the Atreus 3C system in the routine setting of the blood centre. Yield and in vitro quality of the final blood components processed with the two systems were evaluated and compared. Results The Atreus 3C system enabled higher throughput while requiring less space and employee time by decreasing the amount of equipment and processing time per unit of whole blood processed. Whole blood units processed on the Atreus 3C system gave a higher platelet yield, a similar amount of red blood cells and a smaller volume of plasma. Discussion These results support the conclusion that the Atreus 3C system produces blood components meeting quality requirements while providing a high operational efficiency. Implementation of the Atreus 3C system could result in a large organisational improvement. PMID:22044958

  16. Automated processing of whole blood units: operational value and in vitro quality of final blood components.

    PubMed

    Jurado, Marisa; Algora, Manuel; Garcia-Sanchez, Félix; Vico, Santiago; Rodriguez, Eva; Perez, Sonia; Barbolla, Luz

    2012-01-01

    The Community Transfusion Centre in Madrid currently processes whole blood using a conventional procedure (Compomat, Fresenius) followed by automated processing of buffy coats with the OrbiSac system (CaridianBCT). The Atreus 3C system (CaridianBCT) automates the production of red blood cells, plasma and an interim platelet unit from a whole blood unit. Interim platelet unit are pooled to produce a transfusable platelet unit. In this study the Atreus 3C system was evaluated and compared to the routine method with regards to product quality and operational value. Over a 5-week period 810 whole blood units were processed using the Atreus 3C system. The attributes of the automated process were compared to those of the routine method by assessing productivity, space, equipment and staffing requirements. The data obtained were evaluated in order to estimate the impact of implementing the Atreus 3C system in the routine setting of the blood centre. Yield and in vitro quality of the final blood components processed with the two systems were evaluated and compared. The Atreus 3C system enabled higher throughput while requiring less space and employee time by decreasing the amount of equipment and processing time per unit of whole blood processed. Whole blood units processed on the Atreus 3C system gave a higher platelet yield, a similar amount of red blood cells and a smaller volume of plasma. These results support the conclusion that the Atreus 3C system produces blood components meeting quality requirements while providing a high operational efficiency. Implementation of the Atreus 3C system could result in a large organisational improvement.

  17. Study on electrostatic and electromagnetic probes operated in ceramic and metallic depositing plasmas

    NASA Astrophysics Data System (ADS)

    Styrnoll, T.; Bienholz, S.; Lapke, M.; Awakowicz, P.

    2014-04-01

    This paper discusses plasma probe diagnostics, namely the multipole resonance probe (MRP) and Langmuir probe (LP), operated in depositing plasmas. The aim of this work is to show that the combination of both probes provides stable and robust measurements and clear determination of plasma parameters for metallic and ceramic coating processes. The probes use different approaches to determine plasma parameters, e.g. electron density ne and electron temperature Te. The LP is a well-established plasma diagnostic, and its applicability in technological plasmas is well documented. The LP is a dc probe that performs a voltage sweep and analyses the measured current, which makes it insensitive against conductive metallic coating. However, once the LP is dielectrically coated with a ceramic film, its functionality is constricted. In contrast, the MRP was recently presented as a monitoring tool, which is insensitive to coating with dielectric ceramics. It is a new plasma diagnostic based on the concept of active plasma resonance spectroscopy, which uses the universal characteristic of all plasmas to resonate on or near the electron plasma frequency. The MRP emits a frequency sweep and the absorption of the signal, the |S11| parameter, is analysed. Since the MRP concept is based on electromagnetic waves, which are able to transmit dielectrics, it is insensitive to dielectric coatings. But once the MRP is metallized with a thin conductive film, no undisturbed RF-signal can be emitted into the plasma, which leads to falsified plasma parameter. In order to compare both systems, during metallic or dielectric coating, the probes are operated in a magnetron CCP, which is equipped with a titanium target. We present measurements in metallic and dielectric coating processes with both probes and elaborate advantages and problems of each probe operated in each coating environment.

  18. Automated Plasma Spray (APS) process feasibility study

    NASA Technical Reports Server (NTRS)

    Fetheroff, C. W.; Derkacs, T.; Matay, I. M.

    1981-01-01

    An automated plasma spray (APS) process was developed to apply two layer (NiCrAlY and ZrO2-12Y2O3) thermal barrier coatings to aircraft and stationary gas turbine engine blade airfoils. The APS process hardware consists of four subsystems: a mechanical positioning subsystem incorporating two interlaced six degree of freedom assemblies (one for coating deposition and one for coating thickness monitoring); a noncoherent optical metrology subsystem (for in process gaging of the coating thickness buildup at specified points on the specimen); a microprocessor based adaptive system controller (to achieve the desired overall thickness profile on the specimen); and commerical plasma spray equipment. Over fifty JT9D first stage aircraft turbine blade specimens, ten W501B utility turbine blade specimens and dozens of cylindrical specimens were coated with the APS process in preliminary checkout and evaluation studies. The best of the preliminary turbine blade specimens achieved an overall coating thickness uniformity of 53 micrometers (2.1 mils), much better than is achievable manually. Comparative evaluations of coating thickness uniformity for manually sprayed and APS coated specimens were performed. One of the preliminary turbine blade evaluation specimens was subjected to a torch test and metallographic evaluation. Some cylindrical specimens coated with the APS process survived up to 2000 cycles in subsequent burner rig testing.

  19. Patterning of Indium Tin Oxide Films

    NASA Technical Reports Server (NTRS)

    Immer, Christopher

    2008-01-01

    A relatively rapid, economical process has been devised for patterning a thin film of indium tin oxide (ITO) that has been deposited on a polyester film. ITO is a transparent, electrically conductive substance made from a mixture of indium oxide and tin oxide that is commonly used in touch panels, liquid-crystal and plasma display devices, gas sensors, and solar photovoltaic panels. In a typical application, the ITO film must be patterned to form electrodes, current collectors, and the like. Heretofore it has been common practice to pattern an ITO film by means of either a laser ablation process or a photolithography/etching process. The laser ablation process includes the use of expensive equipment to precisely position and focus a laser. The photolithography/etching process is time-consuming. The present process is a variant of the direct toner process an inexpensive but often highly effective process for patterning conductors for printed circuits. Relative to a conventional photolithography/ etching process, this process is simpler, takes less time, and is less expensive. This process involves equipment that costs less than $500 (at 2005 prices) and enables patterning of an ITO film in a process time of less than about a half hour.

  20. Investigation of the boundary layer during the transition from volume to surface dominated H- production at the BATMAN test facility

    NASA Astrophysics Data System (ADS)

    Wimmer, C.; Schiesko, L.; Fantz, U.

    2016-02-01

    BATMAN (Bavarian Test Machine for Negative ions) is a test facility equipped with a 1/8 scale H- source for the ITER heating neutral beam injection. Several diagnostics in the boundary layer close to the plasma grid (first grid of the accelerator system) followed the transition from volume to surface dominated H- production starting with a Cs-free, cleaned source and subsequent evaporation of caesium, while the source has been operated at ITER relevant pressure of 0.3 Pa: Langmuir probes are used to determine the plasma potential, optical emission spectroscopy is used to follow the caesiation process, and cavity ring-down spectroscopy allows for the measurement of the H- density. The influence on the plasma during the transition from an electron-ion plasma towards an ion-ion plasma, in which negative hydrogen ions become the dominant negatively charged particle species, is seen in a strong increase of the H- density combined with a reduction of the plasma potential. A clear correlation of the extracted current densities (jH-, je) exists with the Cs emission.

  1. Investigation of the boundary layer during the transition from volume to surface dominated H⁻ production at the BATMAN test facility.

    PubMed

    Wimmer, C; Schiesko, L; Fantz, U

    2016-02-01

    BATMAN (Bavarian Test Machine for Negative ions) is a test facility equipped with a 18 scale H(-) source for the ITER heating neutral beam injection. Several diagnostics in the boundary layer close to the plasma grid (first grid of the accelerator system) followed the transition from volume to surface dominated H(-) production starting with a Cs-free, cleaned source and subsequent evaporation of caesium, while the source has been operated at ITER relevant pressure of 0.3 Pa: Langmuir probes are used to determine the plasma potential, optical emission spectroscopy is used to follow the caesiation process, and cavity ring-down spectroscopy allows for the measurement of the H(-) density. The influence on the plasma during the transition from an electron-ion plasma towards an ion-ion plasma, in which negative hydrogen ions become the dominant negatively charged particle species, is seen in a strong increase of the H(-) density combined with a reduction of the plasma potential. A clear correlation of the extracted current densities (j(H(-)), j(e)) exists with the Cs emission.

  2. Multi-Component Current Sheets in the Martian Magnetotail. MAVEN Observations

    NASA Astrophysics Data System (ADS)

    Grigorenko, E.; Zelenyi, L. M.; Vaisberg, O. L.; Ermakov, V.; Dubinin, E.; Malova, H. V.

    2016-12-01

    Current sheets (CSs) are the wide-spread objects in space and laboratory plasmas. The capability of CSs to maintain their stability, efficiently store and convert energy is a challenge to space physicists for many decades. Extensive studies of the CSs showed that the presence of multi-component plasma distribution can significantly affect the CS structure and dynamics. Such features like CS thinning, embedding and bifurcation are often related to the anisotropy of particle velocity distribution functions and multi-component ion composition, and they can be a source for generation of plasma instabilities and current disruption/reconnection. The MAVEN mission equipped with comprehensive instrument suite allows the observations of plasma and magnetic field characteristics with a high time resolution and provides an opportunity to study different processes in the Martian plasma environment. In this work we present the analysis of the CSs observed by MAVEN in the Martian magnetotail and discuss the peculiarities of their structure in relation to the thermal/energy characteristics of different plasma components. The relation to the existing CS models is also discussed. This work is supported by Russian Science Foundation (grant Nr.16-42-01103)

  3. Atmospheric-pressure plasma decontamination/sterilization chamber

    DOEpatents

    Herrmann, Hans W.; Selwyn, Gary S.

    2001-01-01

    An atmospheric-pressure plasma decontamination/sterilization chamber is described. The apparatus is useful for decontaminating sensitive equipment and materials, such as electronics, optics and national treasures, which have been contaminated with chemical and/or biological warfare agents, such as anthrax, mustard blistering agent, VX nerve gas, and the like. There is currently no acceptable procedure for decontaminating such equipment. The apparatus may also be used for sterilization in the medical and food industries. Items to be decontaminated or sterilized are supported inside the chamber. Reactive gases containing atomic and metastable oxygen species are generated by an atmospheric-pressure plasma discharge in a He/O.sub.2 mixture and directed into the region of these items resulting in chemical reaction between the reactive species and organic substances. This reaction typically kills and/or neutralizes the contamination without damaging most equipment and materials. The plasma gases are recirculated through a closed-loop system to minimize the loss of helium and the possibility of escape of aerosolized harmful substances.

  4. Space Shuttle ET Friction Stir Weld Machines

    NASA Technical Reports Server (NTRS)

    Thompson, Jack M.

    2003-01-01

    NASA and Lockheed-Martin approached the FSW machine vendor community with a specification for longitudinal barrel production FSW weld machines and a shorter travel process development machine in June of 2000. This specification was based on three years of FSW process development on the Space Shuttle External Tank alloys, AL2 195-T8M4 and AL22 19-T87. The primary motivations for changing the ET longitudinal welds from the existing variable polarity Plasma Arc plasma weld process included: (1) Significantly reduced weld defect rates and related reduction in cycle time and uncertainty; (2) Many fewer process variables to control (5 vs. 17); (3) Fewer manufacturing steps; (4) Lower residual stresses and distortion; (5) Improved weld strengths, particularly at cryogenic temperatures; (6) Fewer hazards to production personnel. General Tool was the successful bidder. The equipment is at this writing installed and welding flight hardware. This paper is a means of sharing with the rest of the FSW community the unique features developed to assure NASA/L-M of successful production welds.

  5. Low-Temperature Nitriding of Pure Titanium by using Hollow Cathode RF-DC Plasma

    NASA Astrophysics Data System (ADS)

    Windajanti, J. M.; S, D. J. Djoko H.; Abdurrouf

    2017-05-01

    Pure titanium is widely used for the structures and mechanical parts due to its high strength, low density, and high corrosion resistance. Unfortunately, titanium products suffer from low hardness and low wear resistance. Titanium’s surface can be modified by nitriding process to overcome such problems, which is commonly conducted at high temperature. Here, we report the low-temperature plasma nitriding process, where pure titanium was utilized by high-density RF-DC plasma combined with hollow cathode device. To this end, a pure titanium plate was set inside a hollow tube placed on the cathode plate. After heating to 450 °C, a pre-sputtering process was conducted for 1 hour to remove the oxide layer and activate the surface for nitriding. Plasma nitriding using N2/H2 gasses was performed in 4 and 8 hours with the RF voltage of 250 V, DC bias of -500 to -600 V, and gas pressure of 75 to 30 Pa. To study the nitriding mechanism as well as the role of hollow cathode, the nitrided specimen was characterized by SEM, EDX, XRD, and micro-hardness equipment. The TiN compound was obtained with the diffusion zone of nitrogen until 5 μm thickness for 4 hours nitriding process, and 8 μm for 8 hours process. The average hardness also increased from 300 HV in the untreated specimen to 624 HV and 792 HV for 4 and 8 hours nitriding, respectively.

  6. Direct Simulation Monte Carlo Simulations of Low Pressure Semiconductor Plasma Processing

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Gochberg, L. A.; Ozawa, T.; Deng, H.

    2008-12-31

    The two widely used plasma deposition tools for semiconductor processing are Ionized Metal Physical Vapor Deposition (IMPVD) of metals using either planar or hollow cathode magnetrons (HCM), and inductively-coupled plasma (ICP) deposition of dielectrics in High Density Plasma Chemical Vapor Deposition (HDP-CVD) reactors. In these systems, the injected neutral gas flows are generally in the transonic to supersonic flow regime. The Hybrid Plasma Equipment Model (HPEM) has been developed and is strategically and beneficially applied to the design of these tools and their processes. For the most part, the model uses continuum-based techniques, and thus, as pressures decrease below 10more » mTorr, the continuum approaches in the model become questionable. Modifications have been previously made to the HPEM to significantly improve its accuracy in this pressure regime. In particular, the Ion Monte Carlo Simulation (IMCS) was added, wherein a Monte Carlo simulation is used to obtain ion and neutral velocity distributions in much the same way as in direct simulation Monte Carlo (DSMC). As a further refinement, this work presents the first steps towards the adaptation of full DSMC calculations to replace part of the flow module within the HPEM. Six species (Ar, Cu, Ar*, Cu*, Ar{sup +}, and Cu{sup +}) are modeled in DSMC. To couple SMILE as a module to the HPEM, source functions for species, momentum and energy from plasma sources will be provided by the HPEM. The DSMC module will then compute a quasi-converged flow field that will provide neutral and ion species densities, momenta and temperatures. In this work, the HPEM results for a hollow cathode magnetron (HCM) IMPVD process using the Boltzmann distribution are compared with DSMC results using portions of those HPEM computations as an initial condition.« less

  7. Optimizing process and equipment efficiency using integrated methods

    NASA Astrophysics Data System (ADS)

    D'Elia, Michael J.; Alfonso, Ted F.

    1996-09-01

    The semiconductor manufacturing industry is continually riding the edge of technology as it tries to push toward higher design limits. Mature fabs must cut operating costs while increasing productivity to remain profitable and cannot justify large capital expenditures to improve productivity. Thus, they must push current tool production capabilities to cut manufacturing costs and remain viable. Working to continuously improve mature production methods requires innovation. Furthermore, testing and successful implementation of these ideas into modern production environments require both supporting technical data and commitment from those working with the process daily. At AMD, natural work groups (NWGs) composed of operators, technicians, engineers, and supervisors collaborate to foster innovative thinking and secure commitment. Recently, an AMD NWG improved equipment cycle time on the Genus tungsten silicide (WSi) deposition system. The team used total productive manufacturing (TPM) to identify areas for process improvement. Improved in-line equipment monitoring was achieved by constructing a real time overall equipment effectiveness (OEE) calculator which tracked equipment down, idle, qualification, and production times. In-line monitoring results indicated that qualification time associated with slow Inspex turn-around time and machine downtime associated with manual cleans contributed greatly to reduced availability. Qualification time was reduced by 75% by implementing a new Inspex monitor pre-staging technique. Downtime associated with manual cleans was reduced by implementing an in-situ plasma etch back to extend the time between manual cleans. A designed experiment was used to optimize the process. Time between 18 hour manual cleans has been improved from every 250 to every 1500 cycles. Moreover defect density realized a 3X improvement. Overall, the team achieved a 35% increase in tool availability. This paper details the above strategies and accomplishments.

  8. Plasma chemistry and its applications

    NASA Technical Reports Server (NTRS)

    Hozumi, K.

    1980-01-01

    The relationship between discharge phenomena and plasma chemistry, as well as the equipment and mechanisms of plasma chemical reactions are described. Various areas in which plasma chemistry is applied are surveyed, such as: manufacturing of semiconductor integrated circuits; synthetic fibers; high polymer materials for medical uses; optical lenses; and membrane filters (reverse penetration films).

  9. Real time closed loop control of an Ar and Ar/O2 plasma in an ICP

    NASA Astrophysics Data System (ADS)

    Faulkner, R.; Soberón, F.; McCarter, A.; Gahan, D.; Karkari, S.; Milosavljevic, V.; Hayden, C.; Islyaikin, A.; Law, V. J.; Hopkins, M. B.; Keville, B.; Iordanov, P.; Doherty, S.; Ringwood, J. V.

    2006-10-01

    Real time closed loop control for plasma assisted semiconductor manufacturing has been the subject of academic research for over a decade. However, due to process complexity and the lack of suitable real time metrology, progress has been elusive and genuine real time, multi-input, multi-output (MIMO) control of a plasma assisted process has yet to be successfully implemented in an industrial setting. A Splasma parameter control strategy T is required to be adopted whereby process recipes which are defined in terms of plasma properties such as critical species densities as opposed to input variables such as rf power and gas flow rates may be transferable between different chamber types. While PIC simulations and multidimensional fluid models have contributed considerably to the basic understanding of plasmas and the design of process equipment, such models require a large amount of processing time and are hence unsuitable for testing control algorithms. In contrast, linear dynamical empirical models, obtained through system identification techniques are ideal in some respects for control design since their computational requirements are comparatively small and their structure facilitates the application of classical control design techniques. However, such models provide little process insight and are specific to an operating point of a particular machine. An ideal first principles-based, control-oriented model would exhibit the simplicity and computational requirements of an empirical model and, in addition, despite sacrificing first principles detail, capture enough of the essential physics and chemistry of the process in order to provide reasonably accurate qualitative predictions. This paper will discuss the development of such a first-principles based, control-oriented model of a laboratory inductively coupled plasma chamber. The model consists of a global model of the chemical kinetics coupled to an analytical model of power deposition. Dynamics of actuators including mass flow controllers and exhaust throttle are included and sensor characteristics are also modelled. The application of this control-oriented model to achieve multivariable closed loop control of specific species e.g. atomic Oxygen and ion density using the actuators rf power, Oxygen and Argon flow rates, and pressure/exhaust flow rate in an Ar/O2 ICP plasma will be presented.

  10. Selective dry etching of silicon containing anti-reflective coating

    NASA Astrophysics Data System (ADS)

    Sridhar, Shyam; Nolan, Andrew; Wang, Li; Karakas, Erdinc; Voronin, Sergey; Biolsi, Peter; Ranjan, Alok

    2018-03-01

    Multi-layer patterning schemes involve the use of Silicon containing Anti-Reflective Coating (SiARC) films for their anti-reflective properties. Patterning transfer completion requires complete and selective removal of SiARC which is very difficult due to its high silicon content (>40%). Typically, SiARC removal is accomplished through a non-selective etch during the pattern transfer process using fluorine containing plasmas, or an ex-situ wet etch process using hydrofluoric acid is employed to remove the residual SiARC, post pattern transfer. Using a non-selective etch may result in profile distortion or wiggling, due to distortion of the underlying organic layer. The drawbacks of using wet etch process for SiARC removal are increased overall processing time and the need for additional equipment. Many applications may involve patterning of active structures in a poly-Si layer with an underlying oxide stopping layer. In such applications, SiARC removal selective to oxide using a wet process may prove futile. Removing SiARC selectively to SiO2 using a dry etch process is also challenging, due to similarity in the nature of chemical bonds (Si - O) in the two materials. In this work, we present highly selective etching of SiARC, in a plasma driven by a surface wave radial line slot antenna. The first step in the process involves an in-situ modification of the SiARC layer in O2 plasma followed by selective etching in a NF3/H2 plasma. Surface treatment in O2 plasma resulted in enhanced etching of the SiARC layer. For the right processing conditions, in-situ NF3/H2 dry etch process demonstrated selectivity values greater than 15:1 with respect to SiO2. The etching chemistry, however, was sensitive to NF3:H2 gas ratio. For dilute NF3 in H2, no SiARC etching was observed. Presumably, this is due to the deposition of ammonium fluorosilicate layer that occurs for dilute NF3/H2 plasmas. Additionally, challenges involved in selective SiARC removal (selective to SiO2, organic and Si layers) post pattern transfer, in a multi-layer structure will be discussed.

  11. Improving by postoxidation of corrosion resistance of plasma nitrocarburized AISI 316 stainless steels

    NASA Astrophysics Data System (ADS)

    Yenilmez, A.; Karakan, M.; Çelik, İ.

    2017-01-01

    Austenitic stainless steels are widely used in several industries such as chemistry, food, health and space due to their perfect corrosion resistance. However, in addition to corrosion resistance, the mechanic and tribological features such as wear resistance and friction are required to be good in the production and engineering of this type of machines, equipment and mechanic parts. In this study, ferritic (FNC) and austenitic (ANC) nitrocarburizing were applied on AISI 316 stainless steel specimens with perfect corrosion resistance in the plasma environment at the definite time (4 h) and constant gas mixture atmosphere. In order to recover corrosion resistance which was deteriorated after nitrocarburizing again, plasma postoxidation process (45 min) was applied. After the duplex treatment, the specimens' structural analyses with XRD and SEM methods, corrosion analysis with polarization method and surface hardness with microhardness method were examined. At the end of the studies, AISI 316 surface hardness of stainless steel increased with nitrocarburizing process, but the corrosion resistance was deteriorated with FNC (570 °C) and ANC (670 °C) nitrocarburizing. With the following of the postoxidation treatment, it was detected that the corrosion resistance became better and it approached its value before the process.

  12. Experience of high-nitrogenous steel powder application in repairs and surface hardening of responsible parts for power equipment by plasma spraying

    NASA Astrophysics Data System (ADS)

    Kolpakov, A. S.; Kardonina, N. I.

    2016-02-01

    The questions of the application of novel diffusion-alloying high-nitrogenous steel powders for repair and surface hardening of responsible parts of power equipment by plasma spraying are considered. The appropriateness of the method for operative repair of equipment and increasing its service life is justified. General data on the structure, properties, and manufacture of nitrogen-, aluminum-, and chromium-containing steel powders that are economically alloyed using diffusion are described. It is noted that the nitrogen release during the decomposition of iron nitrides, when heating, protects the powder particles from oxidation in the plasma jet. It is shown that the coating retains 50% of nitrogen that is contained in the powder. Plasma spraying modes for diffusion-alloying high-nitrogenous steel powders are given. The service properties of plasma coatings based on these powders are analyzed. It is shown that the high-nitrogenous steel powders to a nitrogen content of 8.9 wt % provide the necessary wear resistance and hardness of the coating and the strength of its adhesion to the substrate and corrosion resistance to typical aggressive media. It is noted that increasing the coating porosity promotes stress relaxation and increases its thickness being limited with respect to delamination conditions in comparison with dense coatings on retention of the low defectiveness of the interface and high adhesion to the substrate. The examples of the application of high-nitrogenous steel powders in power engineering during equipment repairs by service companies and overhaul subdivisions of heat power plants are given. It is noted that the plasma spraying of diffusion-alloyed high-nitrogenous steel powders is a unique opportunity to restore nitrided steel products.

  13. Investigation on transmission and reflection characteristics of plasma array to 6 GHz high-power microwave

    NASA Astrophysics Data System (ADS)

    Yang, Liu; Yang, Zhongcun; Wan, Jianing; Liu, Hao

    2016-10-01

    For the safety of electronic equipment, a double-layer barrier of cylindrical plasma array was designed, and its protective performance to high-power microwave (HPM) were analyzed and the protective performance experiment was conducted. Combining the density distribution characteristic of the discharge plasma, the shielding effectiveness of the double-layer plasma on 6GHz HPM pulse was studied. The experiment results indicate that the protective effectiveness of two layers plasma array is better than that of one layer. Two layers plasma array can make the peak electric field of transmission waveform less than interference threshold of electronic equipment to achieve better protection effectiveness. Transmission attenuation of one layer and two layers plasma array to HPM can reach -6.6066dB and -24.9357dB. The results also show that for the existence of multiple reflection, even the plasma electron density is not high enough, it can realize a strong attenuation. The experiment results in this paper are of great significance in protecting against HPM and electromagnetic pulse.

  14. Development of a model and test equipment for cold flow tests at 500 atm of small nuclear light bulb configurations

    NASA Technical Reports Server (NTRS)

    Jaminet, J. F.

    1972-01-01

    A model and test equipment were developed and cold-flow-tested at greater than 500 atm in preparation for future high-pressure rf plasma experiments and in-reactor tests with small nuclear light bulb configurations. With minor exceptions, the model chamber is similar in design and dimensions to a proposed in-reactor geometry for tests with fissioning uranium plasmas in the nuclear furnace. The model and the equipment were designed for use with the UARL 1.2-MW rf induction heater in tests with rf plasmas at pressures up to 500 atm. A series of cold-flow tests of the model was then conducted at pressures up to about 510 atm. At 504 atm, the flow rates of argon and cooling water were 3.35 liter/sec (STP) and 26 gal/min, respectively. It was demonstrated that the model is capable of being operated for extended periods at the 500-atm pressure level and is, therefore, ready for use in initial high-pressure rf plasma experiments.

  15. Measurements of Laser Plasma Instability (LPI) and Electron Density/Temperature Profiles in Plasmas Produced by the Nike KrF Laser

    NASA Astrophysics Data System (ADS)

    Oh, Jaechul; Weaver, J. L.; Serlin, V.; Obenschain, S. P.

    2016-10-01

    We will present results of simultaneous measurements of LPI-driven light scattering and density/temperature profiles in CH plasmas produced by the Nike krypton fluoride laser (λ = 248 nm). The primary diagnostics for the LPI measurement are time-resolved spectrometers with absolute intensity calibration in spectral ranges relevant to the optical detection of stimulated Raman scattering or two plasmon decay. The spectrometers are capable of monitoring signal intensity relative to thermal background radiation from plasma providing a useful way to analyze LPI initiation. For further understanding of LPI processes, the recently implemented grid image refractometer (Nike-GIR)a is used to measure the coronal plasma profiles. In this experiment, Nike-GIR is equipped with a 5th harmonic probe laser (λ = 213 nm) in attempt to probe into a high density region over the previous peak density with λ = 263 nm probe light ( 4 ×1021 cm-3). The LPI behaviors will be discussed with the measured data sets. Work supported by DoE/NNSA.

  16. Remote network control plasma diagnostic system for Tokamak T-10

    NASA Astrophysics Data System (ADS)

    Troynov, V. I.; Zimin, A. M.; Krupin, V. A.; Notkin, G. E.; Nurgaliev, M. R.

    2016-09-01

    The parameters of molecular plasma in closed magnetic trap is studied in this paper. Using the system of molecular diagnostics, which was designed by the authors on the «Tokamak T-10» facility, the radiation of hydrogen isotopes at the plasma edge is investigated. The scheme of optical radiation registration within visible spectrum is described. For visualization, identification and processing of registered molecular spectra a new software is developed using MatLab environment. The software also includes electronic atlas of electronic-vibrational-rotational transitions for molecules of protium and deuterium. To register radiation from limiter cross-section a network control system is designed using the means of the Internet/Intranet. Remote control system diagram and methods are given. The examples of web-interfaces for working out equipment control scenarios and viewing of results are provided. After test run in Intranet, the remote diagnostic system will be accessible through Internet.

  17. Titanium bone implants with superimposed micro/nano-scale porosity and antibacterial capability

    NASA Astrophysics Data System (ADS)

    Necula, B. S.; Apachitei, I.; Fratila-Apachitei, L. E.; van Langelaan, E. J.; Duszczyk, J.

    2013-05-01

    This study aimed at producing a multifunctional layer with micro/nano-interconnected porosity and antibacterial capability on a rough macro-porous plasma sprayed titanium surface using the plasma electrolytic oxidation process. The layers were electrochemically formed in electrolytes based on calcium acetate and calcium glycerophosphate salts bearing dispersed Ag nanoparticles. They were characterized with respect to surface morphology and chemical composition using a scanning electron microscope equipped with the energy dispersive spectroscopy and back scattering detectors. Scanning electron microscopy images showed the formation of a micro/nano-scale porous layer, comprised of TiO2 bearing Ca and P species and Ag nanoparticles, following accurately the surface topography of the plasma sprayed titanium coating. The Ca/P atomic ratio was found to be close to that of bone apatite. Ag nanoparticles were incorporated on both on top and inside the porous structure of the TiO2 layer.

  18. Quantification of Stable Isotope Traces Close to Natural Enrichment in Human Plasma Metabolites Using Gas Chromatography-Mass Spectrometry.

    PubMed

    Krämer, Lisa; Jäger, Christian; Trezzi, Jean-Pierre; Jacobs, Doris M; Hiller, Karsten

    2018-02-14

    Currently, changes in metabolic fluxes following consumption of stable isotope-enriched foods are usually limited to the analysis of postprandial kinetics of glucose. Kinetic information on a larger diversity of metabolites is often lacking, mainly due to the marginal percentage of fully isotopically enriched plant material in the administered food product, and hence, an even weaker 13 C enrichment in downstream plasma metabolites. Therefore, we developed an analytical workflow to determine weak 13 C enrichments of diverse plasma metabolites with conventional gas chromatography-mass spectrometry (GC-MS). The limit of quantification was increased by optimizing (1) the metabolite extraction from plasma, (2) the GC-MS measurement, and (3) most importantly, the computational data processing. We applied our workflow to study the catabolic dynamics of 13 C-enriched wheat bread in three human subjects. For that purpose, we collected time-resolved human plasma samples at 16 timepoints after the consumption of 13 C-labeled bread and quantified 13 C enrichment of 12 metabolites (glucose, lactate, alanine, glycine, serine, citrate, glutamate, glutamine, valine, isoleucine, tyrosine, and threonine). Based on isotopomer specific analysis, we were able to distinguish catabolic profiles of starch and protein hydrolysis. More generally, our study highlights that conventional GC-MS equipment is sufficient to detect isotope traces below 1% if an appropriate data processing is integrated.

  19. Quantification of Stable Isotope Traces Close to Natural Enrichment in Human Plasma Metabolites Using Gas Chromatography-Mass Spectrometry

    PubMed Central

    Krämer, Lisa; Jäger, Christian; Jacobs, Doris M.; Hiller, Karsten

    2018-01-01

    Currently, changes in metabolic fluxes following consumption of stable isotope-enriched foods are usually limited to the analysis of postprandial kinetics of glucose. Kinetic information on a larger diversity of metabolites is often lacking, mainly due to the marginal percentage of fully isotopically enriched plant material in the administered food product, and hence, an even weaker 13C enrichment in downstream plasma metabolites. Therefore, we developed an analytical workflow to determine weak 13C enrichments of diverse plasma metabolites with conventional gas chromatography-mass spectrometry (GC-MS). The limit of quantification was increased by optimizing (1) the metabolite extraction from plasma, (2) the GC-MS measurement, and (3) most importantly, the computational data processing. We applied our workflow to study the catabolic dynamics of 13C-enriched wheat bread in three human subjects. For that purpose, we collected time-resolved human plasma samples at 16 timepoints after the consumption of 13C-labeled bread and quantified 13C enrichment of 12 metabolites (glucose, lactate, alanine, glycine, serine, citrate, glutamate, glutamine, valine, isoleucine, tyrosine, and threonine). Based on isotopomer specific analysis, we were able to distinguish catabolic profiles of starch and protein hydrolysis. More generally, our study highlights that conventional GC-MS equipment is sufficient to detect isotope traces below 1% if an appropriate data processing is integrated. PMID:29443915

  20. Potential Industrial Applications of the One Atmosphere Uniform Glow Discharge Plasma (OAUGDP) Operating in Ambient Air

    NASA Astrophysics Data System (ADS)

    Reece Roth, J.

    2004-11-01

    The majority of industrial plasma processing with glow discharges has been conducted at pressures below 10 torr. This tends to limit applications to high value workpieces as a result of the high capital cost of vacuum systems and the production constraints of batch processing. It has long been recognized that glow discharge plasmas would play a much larger industrial role if they could be generated at one atmosphere. The One Atmosphere Uniform Glow Discharge Plasma (OAUGDP), developed at the University of Tennessee's Plasma Sciences Laboratory, is a non-thermal RF plasma operating on displacement currents with the time-resolved characteristics of a classical low pressure DC normal glow discharge. As a glow discharge, the OAUGDP operates with maximum electrical efficiency at the Stoletow point, where the energy input per ion-electron pair is a minimum [1, 2]. Several interdisciplinary teams have investigated potential applications of the OAUGDP. These teams included collaborators from the UTK Textiles and Nonwovens Development Center (TANDEC), and the Departments of Electrical and Computer Engineering, Microbiology, and Food Science and Technology, as well as the NASA Langley Research Center. The potential applications of the OAUGDP have all been at one atmosphere and room temperature, using air as the working gas. These applications include sterilizing medical and dental equipment; sterilizable air filters to deal with the "sick building syndrome"; removal of soot from Diesel engine exhaust; subsonic plasma aerodynamic effects, including flow re-attachment to airfoils and boundary layer modification; electrohydrodynamic (EDH) flow control of working gases; increasing the surface energy of materials; improving the adhesion of paints and electroplated layers: improving the wettability and wickability of fabrics; stripping of photoresist; and plasma deposition and directional etching of potential microelectronic relevance. [1] J. R. Roth, Industrial Plasma Engineering: Volume I, Principles. Institute of Physics Publishing, Bristol and Philadelphia 1995, ISBN 0-7503-0318-2. [2] Roth, J. R. Industrial Plasma Engineering: Volume II Applications to Nonthermal Plasma Processing Institute of Physics Publishing, Bristol and Philadelphia. 2001, ISBN 0-7503-0545-2.

  1. Impact of cold plasma on Citrobacter freundii in apple juice: inactivation kinetics and mechanisms.

    PubMed

    Surowsky, Björn; Fröhling, Antje; Gottschalk, Nathalie; Schlüter, Oliver; Knorr, Dietrich

    2014-03-17

    Various studies have shown that cold plasma is capable of inactivating microorganisms located on a variety of food surfaces, food packaging materials and process equipment under atmospheric pressure conditions; however, less attention has been paid to the impact of cold plasma on microorganisms in liquid foodstuffs. The present study investigates cold plasma's ability to inactivate Citrobacter freundii in apple juice. Optical emission spectroscopy (OES) and temperature measurements were performed to characterise the plasma source. The plasma-related impact on microbial loads was evaluated by traditional plate count methods, while morphological changes were determined using scanning electron microscopy (SEM). Physiological property changes were obtained through flow cytometric measurements (membrane integrity, esterase activity and membrane potential). In addition, mathematical modelling was performed in order to achieve a reliable prediction of microbial inactivation and to establish the basis for possible industrial implementation. C. freundii loads in apple juice were reduced by about 5 log cycles after a plasma exposure of 480s using argon and 0.1% oxygen plus a subsequent storage time of 24h. The results indicate that a direct contact between bacterial cells and plasma is not necessary for achieving successful inactivation. The plasma-generated compounds in the liquid, such as H2O2 and most likely hydroperoxy radicals, are particularly responsible for microbial inactivation. Copyright © 2014. Published by Elsevier B.V.

  2. From laser spectroscopy research to nonlinear optics instruction

    NASA Astrophysics Data System (ADS)

    de la Rosa, M. I.; Pérez, C.; Grützmacher, K.

    2005-10-01

    In this paper we describe how to join the two fundamental activities of a university professor: research and teaching. The work of our research team is devoted to the applications of two photon polarization spectroscopy to plasmas and combustion processes diagnostics. As a result of this work now we have powerful equipment and experience on nonlinear processes. Therefore, we decided to offer Nonlinear Optics as an elective subject, to the students in the last year of the Physics Degree at Valladolid University. We conclude that research at the University acquires its total significance when it is applied to the student's instruction.

  3. Effect of the self-pumped limiter concept on the tritium fuel cycle

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Finn, P.A.; Sze, D.K.; Hassanein, A.

    1988-09-01

    The self-pumped limiter concept was the impurity control system for the reactor in the Tokamak Power Systems Study (TPSS). The use of a self-pumped limiter had a major impact on the design of the tritium systems of the TPSS fusion reactor. The self-pumped limiter functions by depositing the helium ash under a layer of metal (vanadium). The majority of the hydrogen species are recycled at the plasma edge; a small fraction permeates to the blanket/coolant which was lithium in TPSS. Use of the self-pumped limiter results in the elimination of the plasma processing system. Thus, the blanket tritium processing systemmore » becomes the major tritium system. The main advantages achieved for the tritium systems with a self-pumped limiter are a reduction in the capital cost of tritium processing equipment as well as a reduction in building space, a reduced tritium inventory for processing and for reserve storage, an increase in the inherent safety of the fusion plant and an improvement in economics for a fusion world economy.« less

  4. Atmosphere, Magnetosphere and Plasmas in Space (AMPS). Spacelab payload definition study. Volume 4, book 2: Labcraft instrument systems general specification

    NASA Technical Reports Server (NTRS)

    1976-01-01

    The interfaces between the scientific instruments and the Spacelab/Labcraft equipment are described. The characteristics of the Spacelab/Labcraft equipment pertinent to the scientific instruments and the requirements placed on the scientific instruments by the Spacelab/Labcraft equipment are described.

  5. Separation of whole blood into plasma and red cells by using a hollow-fibre filtration system.

    PubMed

    Hornsey, V S; McColl, K; Drummond, O; Prowse, C V

    2005-08-01

    The aim of this study was to assess the separation of whole blood into red cells and plasma by using the Sangofer device, which is a gravity-fed, hollow-fibre system. The components would then be compared with those produced by the use of more elaborate technical equipment. Ten whole-blood units were leucoreduced by using a WBF2 filter and immediately separated into red cells and plasma by using the Sangofer blood-separation device. Red cells were stored in additive solution and tested on days 1 and 42. The plasma was assayed for levels of various coagulation factors and for markers of both coagulation and complement activation. The red-cell parameters were similar to those obtained when routine centrifugation methods were used. The filter did not cause haemolysis. Levels of plasma factor VIII and factor XI were lower than those seen in routinely produced leucoreduced plasma units but there was no evidence of activation of the coagulation and complement systems. The Sangofer device is simple and straightforward to use and eliminates the need for both centrifugation and automated separation steps during the processing of whole blood into red cells and plasma components. Minor changes are required to make the procedure easier to incorporate into routine use.

  6. Investigation of RF Emissions from Electric Field Dominated Plasmas

    DTIC Science & Technology

    1989-03-31

    David Rosenberg and Mr. Paul D. Spence, "RF Plasma Emissions Measured with Calibrated, Broadband Antenna". February 19 Mr. Antonino Carnevali, Fusion...plasma equipment exhibitors, and major Japanese i fusion facilities. November 20 Dr. Antonino Carnevalli, RPI and Fusion Energy Division, ORNL: "H av Ion

  7. Research on Heating, Instabilities, Turbulence and RF Emission from Electric Field Dominated Plasmas

    DTIC Science & Technology

    1989-07-01

    Spence, "RF Plasma Emissions Measured with Calibrated, Broadband Antenna". February 19 Mr. Antonino Carnevali, Fusion Energy Division, ORNL,"Confinement...slides of the conference, plasma equipment exhibitors, and major Japanese fusion facilities. November 20 Dr. Antonino Carnevalli, RPI and Fusion Energy

  8. Experimental investigation of the ECRH stray radiation during the start-up phase in Wendelstein 7-X

    NASA Astrophysics Data System (ADS)

    Moseev, Dmitry; Laqua, Heinrich; Marsen, Stefan; Stange, Torsten; Braune, Harald; Erckmann, Volker; Gellert, Florian; Oosterbeek, Johann Wilhelm; Wenzel, Uwe

    2017-07-01

    Electron cyclotron resonance heating (ECRH) is the main heating mechanism in the Wendelstein 7-X stellarator (W7-X). W7-X is equipped with five absolutely calibrated sniffer probes that are installed in each of the five modules of the device. The sniffer probes monitor energy flux of unabsorbed ECRH radiation in the device and interlocks are fed with the sniffer probe signals. The stray radiation level in the device changes significantly during the start-up phase: plasma is a strong microwave absorber and during its formation the stray radiation level in sniffer probes reduces by more than 95%. In this paper, we discuss the influence of neutral gas pressure and gyrotron power on plasma breakdown processes.

  9. Influence of process time on microstructure and properties of 17-4PH steel plasma nitrocarburized with rare earths addition at low temperature

    NASA Astrophysics Data System (ADS)

    Yan, M. F.; Liu, R. L.

    2010-08-01

    17-4PH stainless steel was plasma nitrocarburized at 430 °C for different time with rare earths (RE) addition. Plasma RE nitrocarburized layers were studied by optical microscope, scanning electron microscope equipped with an energy dispersive X-ray analyzer, X-ray diffraction, microhardness tests, pin-on-disc tribometer and anodic polarization tests. The results show that rare earths atoms can diffuse into the surface of 17-4PH steel. The modified layer depths increase with increasing process time and the layer growth conforms approximately to the parabolic law. The phases in the modified layer are mainly of γ'-Fe 4N, nitrogen and carbon expanded martensite (α' N) as well as some incipient CrN at short time (2 h). With increasing of process time, the phases of CrN and γ'-Fe 4N increase but α' N decomposes gradually. Interestingly, the peaks of γ'-Fe 4N display a high (2 0 0) plane preferred orientation. The hardness of the modified specimen is more than 1340 HV, which is about 3.7 times higher than that of untreated one. The friction coefficients and wear rates of specimens can be dramatically decreased by plasma RE nitrocarburizing. The surface hardness and the friction coefficients decrease gradually with increasing process time. The corrosion test shows that the 8 h treated specimen has the best corrosion resistance with the characterization of lower corrosion current density, a higher corrosion potential and a large passive region as compared with those of untreated one.

  10. Investigation of the helicon discharge plasma parameters in a hybrid RF plasma system

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Aleksandrov, A. F.; Petrov, A. K., E-mail: alpetrov57@gmail.com; Vavilin, K. V.

    2016-03-15

    Results of an experimental study of the helicon discharge plasma parameters in a prototype of a hybrid RF plasma system equipped with a solenoidal antenna are described. It is shown that an increase in the external magnetic field leads to the formation of a plasma column and a shift of the maximum ion current along the discharge axis toward the bottom flange of the system. The shape of the plasma column can be controlled via varying the configuration of the magnetic field.

  11. The SCOPE mission

    NASA Astrophysics Data System (ADS)

    Fujimoto, Masaki

    In order to open the new horizon of research in the Plasma Universe, SCOPE will perform simultaneous multi-scale observations that enables data-based study on the key space plasma processes from the cross-scale coupling point of view. The key processes to be studied are magnetic reconnection under various boundary conditions, shocks in space plasma, collisionless plasma mixing at the boundaries, and physics of current sheets embedded in complex magnetic geometries. The orbit is equatorial, 10x25 Re, such that in-situ observations of the above key processes are possible. The SCOPE mission is made up of a pair of mother-daughter spacecraft and a three spacecraft formation. The spacecraft pair will zoom-in to the microphysics while the spacecraft formation will observe macro-scale dynamics surrouding the key region to be studied by the mother-daughter pair. The mother spacecraft is equipped with a full suite of particle detector including ultra-high sampling cycle electron detector. The daughter spacecraft remains near ( 10km) the mother spacecraft and the spacecraft-pair will focus on wave-particle interaction utilizing inter-spacecraft communication. The inter-spacecraft distance of the for-mation varies from below 100km to above 3000km so that surrounding dynamics at various scales (electron, ion and MHD) can be studied. While the core part of the mission is planned to be a CSA-JAXA (Canada-Japan) collaboration, further international collaborations to en-hance the science return of the mission are welcome.

  12. Quantitative evaluation of plasma after methylene blue and white light treatment in four Chinese blood centers.

    PubMed

    Chunhui, Yang; Guohui, Bian; Hong, Yang; Xiaopu, Xiao; Zherong, Bai; Mingyuan, Wang; Xinsheng, Zhang; Juanjuan, Wang; Changqing, Li; Wuping, Li

    2013-12-01

    Pathogen reduction technology is an important process in the blood safety system, including solvent/detergent treatment, filtration and methylene blue-photochemical technology (MB-PCT). To investigate the quality of MB-PCT-treated plasma, plasma samples from four Chinese blood centers were analyzed over 12 months of storage to determine the recovery of activities and levels of various plasma proteins. Ten plasma units each from the Suzhou, Yancheng, Chongqing and Shandong blood centers were divided into two aliquots. One was subjected to treatment with one of two methylene blue-photochemical technology instruments and the other was used as control. The treated and untreated sample pairs were stored at -30°C. The recovery rates of coagulation factors, inhibitor proteins, total protein, immunoglobulins, and complement proteins were measured at different time points after storage. The mean recovery of most proteins exceeded 80% after MB treatment. The exceptions were factor XI and fibrinogen, of which only 71.3-74% and 69.0-92.3% were retained during storage. The two equipment types differed in terms of residual MB concentration in the plasma samples (0.18 μM and 0.29 μM, respectively). They had similar protein recovery rates at 0.5 month but differed at later time points. The four blood centers differed significantly with regard to factor II, V, VIII and fibrinogen activities. Only the samples from the Shandong blood center met the methylene blue treated fresh frozen plasma requirement. The major factor that influenced the quality of the MB-FFP samples was the time taken between blood collection and storage. Methylene blue treated plasma showed reduced coagulation factor (CF) activity and protein levels. The MB treatment-induced damage to the proteins was acceptable at the four Chinese blood centers, but the quality of the MB-treated plasma in general was not satisfactory. The main factor affecting plasma quality may be the duration of the collection and processing. Copyright © 2013 Elsevier Ltd. All rights reserved.

  13. Space Technology for the Iron Foundry

    NASA Technical Reports Server (NTRS)

    1990-01-01

    Electric Power Research Institute (EPRI) initiated development of a plasma melter intended to solve a major problem in the U.S. foundry industry. EPRI is a non-profit organization that manages research and development for some 600 electric utility member companies. For the plasma melter program, EPRI enlisted as co-sponsors Westinghouse Electric's Environmental Systems and Services Division, General Motors Corporation, and Modern Equipment Company, supplier of equipment and services to the foundry industry. General Motor's plasma melter, first in the U.S., is an advanced technology system designed to improve the efficiency of coke-burning cupolas that melt iron to produce automotive castings. The key elements are six Westinghouse plasma torches. Electrically-powered plasma torch creates an ionized gas that superheats air entering the cupola to 10,000 degrees Fahrenheit. That great heat, three times higher than that attainable by oil or natural gas systems, is the key to making iron cheaper, cleaner, and faster. System offers an environmental bonus in reduced cupola emissions. Plasma torches increase GM's electric bill at Defiance, but that cost is more than compensated by the savings in charge material. The EPRI-sponsored Center for Materials Production (CMP) is evaluating the potential of plasma cupola technology.

  14. Is prevention of acute pesticide poisoning effective and efficient, with Locally Adapted Personal Protective Equipment? A randomized crossover study among farmers in Chitwan, Nepal.

    PubMed

    Varma, Anshu; Neupane, Dinesh; Ellekilde Bonde, Jens Peter; Jørs, Erik

    2016-07-26

    Farmers' risk of pesticide poisoning can be reduced with personal protective equipment but in low-income countries farmers' use of such equipment is limited. To examine the effectiveness and efficiency of Locally Adapted Personal Protective Equipment to reduce organophosphate exposure among farmers. In a crossover study, 45 male farmers from Chitwan, Nepal, were randomly allocated to work as usual applying organophosphate pesticides wearing Locally Adapted Personal Protective Equipment or Daily Practice Clothing. For seven days before each experiment, each farmer abstained from using pesticides. Before and after organophosphate application, an interview surveys and blood tests were carried out, and analyzed with paired t-test, frequencies and percentages. The difference between follow-up mean for acute organophosphate poisoning symptoms in the two groups was 0.13 [95% CI -0.22;0.49] and for plasma cholinesterase (U/ml) -0.03 [95% CI -0.11;0.06]. The difference between follow-up mean minus baseline mean for acute organophosphate poisoning symptoms in the two groups was 0.29 [95% CI -0.26;0.84] and for plasma cholinesterase (U/ml) -0.01 [95% CI --0.08;0.06]. Wearing the Locally Adapted Personal Protective Equipment versus Daily Practice Clothing gave the following results, respectively: comfort 75.6% versus 100%, sense of heat 64.4% versus 31.3%, other problems 44.4% versus 33.3%, likeability 95.6% versus 77.8%. We cannot support the expectation that our farmers in Chitwan, Nepal working with Locally Adapted Personal Protective Equipment would have fewer acute organophosphate poisoning symptoms, higher plasma cholinesterase (U/mL) and find it more efficient to work with the equipment than farmers working with their Daily Practice Clothing. Based on the farmers' working behavior, compounds used, intensity and exposure duration we conclude that Locally Adapted Personal Protective Equipment does not provide additional protection during usual work practices. However, our Locally Adapted Personal Protective Equipment might offer protection from (certain) accidental overexposure. Trial Registration NCT02137317.

  15. A Solution in Search of Problems

    NASA Technical Reports Server (NTRS)

    1981-01-01

    Ferrofluids offered vast-problem solving potential. Under license for the NASA technology, Dr. Ronald Moskowitz and Dr. Ronald Rosensweig formed Ferrofluids Corporation. First problem they found a solution for was related to the manufacture of semiconductor "chips" for use in electronic systems. They developed a magnetic seal composed of ferrofluid and a magnetic circuit. Magnetic field confines the ferrofluid in the regions between the stationary elements and the rotary shaft of the seal. Result is a series of liquid barriers that totally bar passage of contaminants. Seal is virtually wear-proof and has a lifetime measured in billions of shaft revolutions. It has reduced maintenance, minimizes "downtime" of production equipment, and reduces the cost of expensive materials that had previously been lost through seal failures. Products based on ferrofluid are exclusion seals for computer disc drives and inertia dampers for stepper motors. Uses are performance-improving, failure-reducing coolants for hi-fi loudspeakers. Other applications include analytical instrumentation, medical equipment, industrial processes, silicon crystal growing furnaces, plasma processes, fusion research, visual displays, and automated machine tools.

  16. Investigation of the DSMC Approach for Ion/neutral Species in Modeling Low Pressure Plasma Reactor

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Deng Hao; Li, Z.; Levin, D.

    2011-05-20

    Low pressure plasma reactors are important tools for ionized metal physical vapor deposition (IMPVD), a semiconductor plasma processing technology that is increasingly being applied to deposit Cu seed layers on semiconductor surfaces of trenches and vias with the high aspect ratio (e.g., >5:1). A large fraction of ionized atoms produced by the IMPVD process leads to an anisotropic deposition flux towards the substrate, a feature which is critical for attaining a void-free and uniform fill. Modeling such devices is challenging due to their high plasma density, reactive environment, but low gas pressure. A modular code developed by the Computational Opticalmore » and Discharge Physics Group, the Hybrid Plasma Equipment Model (HPEM), has been successfully applied to the numerical investigations of IMPVD by modeling a hollow cathode magnetron (HCM) device. However, as the development of semiconductor devices progresses towards the lower pressure regime (e.g., <5 mTorr), the breakdown of the continuum assumption limits the application of the fluid model in HPEM and suggests the incorporation of the kinetic method, such as the direct simulation Monte Carlo (DSMC), in the plasma simulation.The DSMC method, which solves the Boltzmann equation of transport, has been successfully applied in modeling micro-fluidic flows in MEMS devices with low Reynolds numbers, a feature shared with the HCM. Modeling of the basic physical and chemical processes for ion/neutral species in plasma have been developed and implemented in DSMC, which include ion particle motion due to the Lorentz force, electron impact reactions, charge exchange reactions, and charge recombination at the surface. The heating of neutrals due to collisions with ions and the heating of ions due to the electrostatic field will be shown to be captured by the DSMC simulations. In this work, DSMC calculations were coupled with the modules from HPEM so that the plasma can be self-consistently solved. Differences in the Ar results, the dominant species in the reactor, produced by the DSMC-HPEM coupled simulation will be shown in comparison with the original HPEM results. The effects of the DSMC calculations for ion/neutral species on HPEM plasma simulation will be further analyzed.« less

  17. Alternative Green Solvents Project

    NASA Technical Reports Server (NTRS)

    Maloney, Phillip R.

    2012-01-01

    Necessary for safe and proper functioning of equipment. Mainly halogenated solvents. Tetrachloride, Trichloroethylene (TCE), CFC-113. No longer used due to regulatory/safety concerns. Precision Cleaning at KSC: Small % of total parts. Used for liquid oxygen (LOX) systems. Dual solvent process. Vertrel MCA (decafluoropentane (DFP) and trons-dichloroethylene) HFE-7100. DFP has long term environmental concerns. Project Goals: a) Identify potential replacements. b) 22 wet chemical processes. c) 3 alternative processes. d) Develop test procedures. e) Contamination and cleaning. f) Analysis. g) Use results to recommend alternative processes. Conclusions: a) No alternative matched Vertrel in this study. b) No clear second place solvent. c) Hydrocarbons- easy; Fluorinated greases- difficult. d) Fluorinated component may be needed in replacement solvent. e) Process may need to make up for shortcoming of the solvent. f) Plasma and SCC02 warrant further testing.

  18. Medical equipment bio-capability processes using the atmospheric plasma-sprayed titanium coating

    NASA Astrophysics Data System (ADS)

    Rezaei, F.; Saviz, S.; Ghoranneviss, M.

    2017-12-01

    Antibacterial surfaces such as titanium coatings are able to have capability in the human body environment. In this study, titanium coatings are deposited on the 316 stainless steel substrates by a handmade plasma spray system. Some mechanical, chemical properties and microstructure of the created titanium layer are determined to evaluate the quality of coating. The XRD, SEM, adhesion tests from cross cut and corrosion test by potentiodynamic are used. During the different stages, some of the parameters are changed in different samples to achieve the best quality in the coating. It is shown that by increasing the spray time, the production of nanoparticles begins. On the other hand, the best layers are created when the spray main gas flow rate has a certain amount.

  19. Basic Research in Plasma Medicine - A Throughput Approach from Liquids to Cells

    PubMed Central

    Bekeschus, Sander; Schmidt, Anke; Niessner, Felix; Gerling, Torsten; Weltmann, Klaus-Dieter; Wende, Kristian

    2017-01-01

    In plasma medicine, ionized gases with temperatures close to that of vertebrate systems are applied to cells and tissues. Cold plasmas generate reactive species known to redox regulate biological processes in health and disease. Pre-clinical and clinical evidence points to beneficial effects of plasma treatment in the healing of chronic ulcer of the skin. Other emerging topics, such as plasma cancer treatment, are receiving increasing attention. Plasma medical research requires interdisciplinary expertise in physics, chemistry, and biomedicine. One goal of plasma research is to characterize plasma-treated cells in a variety of specific applications. This includes, for example, cell count and viability, cellular oxidation, mitochondrial activity, cytotoxicity and mode of cell death, cell cycle analysis, cell surface marker expression, and cytokine release. This study describes the essential equipment and workflows required for such research in plasma biomedicine. It describes the proper operation of an atmospheric pressure argon plasma jet, specifically monitoring its basic emission spectra and feed gas settings to modulate reactive species output. Using a high-precision xyz-table and computer software, the jet is hovered in millisecond-precision over the cavities of 96-well plates in micrometer-precision for maximal reproducibility. Downstream assays for liquid analysis of redox-active molecules are shown, and target cells are plasma-treated. Specifically, melanoma cells are analyzed in an efficient sequence of different consecutive assays but using the same cells: measurement of metabolic activity, total cell area, and surface marker expression of calreticulin, a molecule important for the immunogenic cell death of cancer cells. These assays retrieve content-rich biological information about plasma effects from a single plate. Altogether, this study describes the essential steps and protocols for plasma medical research. PMID:29286412

  20. Basic Research in Plasma Medicine - A Throughput Approach from Liquids to Cells.

    PubMed

    Bekeschus, Sander; Schmidt, Anke; Niessner, Felix; Gerling, Torsten; Weltmann, Klaus-Dieter; Wende, Kristian

    2017-11-17

    In plasma medicine, ionized gases with temperatures close to that of vertebrate systems are applied to cells and tissues. Cold plasmas generate reactive species known to redox regulate biological processes in health and disease. Pre-clinical and clinical evidence points to beneficial effects of plasma treatment in the healing of chronic ulcer of the skin. Other emerging topics, such as plasma cancer treatment, are receiving increasing attention. Plasma medical research requires interdisciplinary expertise in physics, chemistry, and biomedicine. One goal of plasma research is to characterize plasma-treated cells in a variety of specific applications. This includes, for example, cell count and viability, cellular oxidation, mitochondrial activity, cytotoxicity and mode of cell death, cell cycle analysis, cell surface marker expression, and cytokine release. This study describes the essential equipment and workflows required for such research in plasma biomedicine. It describes the proper operation of an atmospheric pressure argon plasma jet, specifically monitoring its basic emission spectra and feed gas settings to modulate reactive species output. Using a high-precision xyz-table and computer software, the jet is hovered in millisecond-precision over the cavities of 96-well plates in micrometer-precision for maximal reproducibility. Downstream assays for liquid analysis of redox-active molecules are shown, and target cells are plasma-treated. Specifically, melanoma cells are analyzed in an efficient sequence of different consecutive assays but using the same cells: measurement of metabolic activity, total cell area, and surface marker expression of calreticulin, a molecule important for the immunogenic cell death of cancer cells. These assays retrieve content-rich biological information about plasma effects from a single plate. Altogether, this study describes the essential steps and protocols for plasma medical research.

  1. High-density plasma etching of III-nitrides: Process development, device applications and damage remediation

    NASA Astrophysics Data System (ADS)

    Singh, Rajwinder

    Plasma-assisted etching is a key technology for III-nitride device fabrication. The inevitable etch damage resulting from energetic pattern transfer is a challenge that needs to be addressed in order to optimize device performance and reliability. This dissertation focuses on the development of a high-density inductively-coupled plasma (ICP) etch process for III-nitrides, the demonstration of its applicability to practical device fabrication using a custom built ICP reactor, and development of techniques for remediation of etch damage. A chlorine-based standard dry etch process has been developed and utilized in fabrication of a number of electronic and optoelectronic III-nitride devices. Annealing studies carried out at 700°C have yielded the important insight that the annealing time necessary for making good-quality metal contacts to etch processed n-GaN is very short (<30 sec), comparable with the annealing times necessary for dopant activation of p-GaN films and provides an opportunity for streamlining process flow. Plasma etching degrades contact quality on n-GaN films and this degradation has been found to increase with the rf bias levels (ion energies) used, most notably in films with higher doping levels. Immersion in 1:1 mixture of hydrochloric acid and de-ionized water, prior to metallization, removes some of the etch damage and is helpful in recovering contact quality. In-situ treatment consisting of a slow ramp-down of rf bias at the end of the etch is found to achieve the same effect as the ex-situ treatment. This insitu technique is significantly advantageous in a large-scale production environment because it eliminates a process step, particularly one involving treatment in hydrochloric acid. ICP equipment customization for scaling up the process to full 2-inch wafer size is described. Results on etching of state of the art 256 x 256 AlGaN focal plane arrays of ultraviolet photodetectors are reported, with excellent etch uniformity over the wafer area.

  2. Surface Alloying of SUS 321 Chromium-Nickel Steel by an Electron-Plasma Process

    NASA Astrophysics Data System (ADS)

    Ivanov, Yu. F.; Teresov, A. D.; Petrikova, E. A.; Krysina, O. V.; Ivanova, O. V.; Shugurov, V. V.; Moskvin, P. V.

    2017-07-01

    The mechanisms of forming nanostructured, nanophase layers are revealed and analyzed in austenitic steel subjected to surface alloying using an electron-plasma process. Nanostructured, nanophase layers up to 30 μm in thickness were formed by melting of the film/substrate system with an electron beam generated by a SOLO facility (Institute of High Current Electronics, SB RAS), Tomsk), which ensured crystallization and subsequent quenching at the cooling rates within the range 105-108 K/s. The surface was modified with structural stainless steel specimens (SUS 321 steel). The film/substrate system (film thickness 0.5 μm) was formed by a plasma-assisted vacuum-arc process by evaporating a cathode made from a sintered pseudoalloy of the following composition: Zr - 6 at.% Ti - 6 at.% Cu. The film deposition was performed in a QUINTA facility equipped with a PINK hot-cathode plasma source and DI-100 arc evaporators with accelerated cooling of the process cathode, which allowed reducing the size and fraction of the droplet phase in the deposited film. It is found that melting of the film/substrate system (Zr-Ti-Cu)/(SUS 321 steel) using a high-intensity pulsed electron beam followed by the high-rate crystallization is accompanied by the formation of α-iron cellular crystallization structure and precipitation of Cr2Zr, Cr3C2 and TiC particles on the cell boundaries, which as a whole allowed increasing microhardness by a factor of 1.3, Young's modulus - by a factor of 1.2, wear resistance - by a factor of 2.7, while achieving a three-fold reduction in the friction coefficient.

  3. Levitation and collection of diamond fine particles in the rf plasma chamber equipped with a hot filament

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Shimizu, S.; Shimizu, T.; Thomas, H. M.

    2011-11-15

    We demonstrate the levitation of diamond fine particles in a H{sub 2} rf plasma chamber equipped with a hot filament and heated electrodes. The levitation conditions should be carefully chosen to compensate the strong thermophoretic forces caused by the filament and the electrodes. This levitation technique with the existence of a hot filament can be applied, e.g., for the efficient growth of diamond layers on seed particles injected and levitated in an rf plasma with reactive gases, e.g., CH{sub 4}/H{sub 2}. Additionally, the method for direct capture of levitated particles on a planar substrate was established, which is useful ifmore » it is necessary to analyze the particles after the levitation.« less

  4. Capacitively Coupled RF Plasmas for the Synthesis of Silicon Nanocrystals: Scaling and Mechanisms

    NASA Astrophysics Data System (ADS)

    Markosyan, Aram H.; Le Picard, Romain; Porter, David H.; Girshick, Steven L.; Kushner, Mark J.

    2015-09-01

    Silicon nanocrystals (SNCs) are of interest for light emitting electronics, photovoltaics, and biotechnology. SNCs are produced in low pressure capacitively coupled plasmas (CCPs) sustained in SiH4 containing mixtures. To optimize these applications, it is necessary to control the size distribution of the SNCs. Particles 3-5 nm diameter are typically tailored by flow rates and power, however the fundamental processes responsible for this size control are not well understood. We developed a 2-d computer model for RF powered CCPs to predict the synthesis of SNCs. An aerosol sectional model was incorporated into the Hybrid Plasma Equipment Model. The reactor is a quartz tube a few mm in diameter through which 100 sccm Ar and 15 sccm He/SiH4 = 95/5 at 2 Torr are flowed. The SNC residence time is 1-2 ms in the dense plasma region near the electrodes. We found that the distribution of plasma potential is important in determining the growth and size distribution of the SNCs. The SNCs having long residence times in the plasma, thereby enabling growth, are usually negatively charged. To ultimately allow these SNCs to flow out of the plasma, the distribution of the plasma potential must enable the particles to be entrained in the neutral gas flow without a significant potential barrier. We also found that agglomeration of particles of <1 nm is important in the rate of growth of SNCs. Work supported by DOE (DE-SC0001939) and NSF (CHE-124752).

  5. Carcinogenicity of Embedded Tungsten Alloys in Mice

    DTIC Science & Technology

    2011-03-01

    year carcinogenicity (Aim 1) and serial euthanasia (Aim 2) studies were analyzed for metal content using inductively coupled-plasma mass spectrometry...inductively coupled- plasma mass spectrometer (PQ ExCell ICPMS System, ThermoElemental, Franklin, MA) equipped with a Cetac ASX500 Autosampler. High...Metal analysis using inductively coupled-plasma mass spectrometry showed that both the tungsten/nickel/cobalt and tungsten/nickel/iron

  6. The scientific targets of the SCOPE mission

    NASA Astrophysics Data System (ADS)

    Fujimoto, M.; Saito, Y.; Tsuda, Y.; Shinohara, I.; Kojima, H.

    Future Japanese magnetospheric mission "SCOPE" is now under study (planned to be launched in 2012). The main purpose of this mission is to investigate the dynamic behaviors of plasmas in the Earth's magnetosphere from the view-point of cross-scale coupling. Dynamical collisionless space plasma phenomena, be they large scale as a whole, are chracterized by coupling over various time and spatial scales. The best example would be the magnetic reconnection process, which is a large scale energy conversion process but has a small key region at the heart of its engine. Inside the key region, electron scale dynamics plays the key role in liberating the frozen-in constraint, by which reconnection is allowed to proceed. The SCOPE mission is composed of one large mother satellite and four small daughter satellites. The mother spacecraft will be equiped with the electron detector that has 10 msec time resolution so that scales down to the electron's will be resolved. Three of the four daughter satellites surround the mother satellite 3-dimensionally with the mutual distances between several km and several thousand km, which are varied during the mission. Plasma measurements on these spacecrafts will have 1 sec resolution and will provide information on meso-scale plasma structure. The fourth daughter satellite stays near the mother satellite with the distance less than 100km. By correlation between the two plasma wave instruments on the daughter and the mother spacecrafts, propagation of the waves and the information on the electron scale dynamics will be obtained. By this strategy, both meso- and micro-scale information on dynamics are obtained, that will enable us to investigate the physics of the space plasma from the cross-scale coupling point of view.

  7. Application of tunable diode laser absorption spectroscopy in the detection of oxygen

    NASA Astrophysics Data System (ADS)

    Zhou, Xin; Jin, Xing

    2015-10-01

    Most aircrafts is driven by chemic energy which is released in the combustion process. For improving the capability of engine and controlling the running on-time, the processes of fuel physics and chemistry need to be analysis by kinds of high quality sensor. In the research of designing and improving the processes of fuel physics and chemistry, the concentration, temperature and velocity of kinds of gas in the combustor need to be detected and measured. In addition, these engines and research equipments are always in the harsh environment of high temperature, high pressure and high speed. The harsh environment needs the sensor to be high reliability, well repetition, no cross- sensitivity between gases, and the traditional measurement system can't satisfy the metrical requirement well. Tunable diode laser absorption spectroscopy (TDLAS) analytic measurement technology can well satisfy the measurement in the harsh environment, which can support the whole measurement plan and high quality measurement system. Because the TDLAS sensor has the excellence of small bulk, light weight, high reliability and well specifically measurement, the TDLAS measurement technology has wide prospects. Different from most measurements, only a beam of laser can be pass through the measured environment by TDLAS, and the measurement equipment needn't be set in the harsh environment. So, the TDLAS equipment can't be interrupted by the measured equipment. The ability of subsistence in the harsh environment is very valuable, especially in the measurement on the subject of aerospace with environment of high speed, combustion and plasma. This paper focuses on the collecting the articles on the subject of oxygen detection of TDLAS. By analyzing the research and results of the articles, we conclude the central issues, difficulties and results. And we can get some instructive conclusions.

  8. Study of energetic particle dynamics in Harbin Dipole eXperiment (HDX) on Space Plasma Environment Research Facility (SPERF)

    NASA Astrophysics Data System (ADS)

    Zhibin, W.; Xiao, Q.; Wang, X.; Xiao, C.; Zheng, J.; E, P.; Ji, H.; Ding, W.; Lu, Q.; Ren, Y.; Mao, A.

    2015-12-01

    Zhibin Wang1, Qingmei Xiao1, Xiaogang Wang1, Chijie Xiao2, Jinxing Zheng3, Peng E1, Hantao Ji1,5, Weixing Ding4, Quaming Lu6, Y. Ren1,5, Aohua Mao11 Laboratory for Space Environment and Physical Sciences, Harbin Institute of Technology, Harbin, China 150001 2 State Key Lab of Nuclear Physics & Technology, and School of Physics, Peking University, Beijing, China 100871 3ASIPP, Hefei, China, 230031 4University of California at Los Angeles, Los Angeles, CA, 90095 5Princeton Plasma Physics Laboratory, Princeton University, Princeton, NJ 08543 6University of Science and Technology of China, Hefei, China, 230026 A new terrella device for laboratory studies of space physics relevant to the inner magnetospheric plasmas, Harbin Dipole eXperiment (HDX), is scheduled to be built at Harbin Institute of Technology (HIT), China. HDX is one of two essential parts of Space Plasma Environment Research Facility (SPERF), which is a major national research facility for space physics studies. HDX is designed to provide a laboratory experimental platform to reproduce the earth's magnetospheric structure for investigations on the mechanism of acceleration/loss and wave-particle interaction of energetic particles in radiation belt, and on the influence of magnetic storms on the inner magnetosphere. It can be operated together with Harbin Reconnection eXperiment (HRX), which is another part of SPERF, to study the fundamental processes during interactions between solar wind and Earth's magnetosphere. In this presentation, the scientific goals and experimental plans for HDX, together with the means applied to generate the plasma with desired parameters, including multiple plasma sources and different kinds of coils with specific functions, as well as advanced diagnostics designed to be equipped to the facility for multi-functions, are reviewed. Three typical scenarios of HDX with operations of various coils and plasma sources to study specific physical processes in space plasmas will also be presented.

  9. Field repair of coated columbium Thermal Protection System (TPS)

    NASA Technical Reports Server (NTRS)

    Culp, J. D.

    1972-01-01

    The requirements for field repair of coated columbian panels were studied, and the probable cause of damage were identified. The following types of repair methods were developed, and are ready for use on an operational system: replacement of fused slurrey silicide coating by a short processing cycle using a focused radiant spot heater; repair of the coating by a glassy matrix ceramic composition which is painted or sprayed over the defective area; and repair of the protective coating by plasma spraying molybdenum disilicide over the damaged area employing portable equipment.

  10. Application of spark plasma sintering for fabricating Nd-Fe-B composite

    NASA Astrophysics Data System (ADS)

    Sivkov, A. A.; Ivashutenko, A. S.; Lomakina, A. A.

    2015-10-01

    Constant magnets are applied in such fields as electric equipment and electric generators with fixed rotor. Rare earth metal neodymium is well known as promising material. Production of magnets by sintering three elements (neodymium, iron and boron) is one the most promising methods. But there are difficulties in choosing the right temperature for sintering and further processing. Structure and properties of the product, consisted of rare earth metals, was analyzed. X-ray analysis of the resulting product and the finished constant magnet was performed. Vickers microhardness was obtained.

  11. Scientist in the Classroom: The First Year Highlights of a Plasma Outreach Program

    NASA Astrophysics Data System (ADS)

    Nagy, A.; Danielson, C. A.; Lee, R. L.; Winter, P. S.; Valentine, J. R.

    1999-11-01

    The General Atomics education program ``Scientist in the Classroom'' uses scientists, engineers, and technicians to discuss plasma physics with students in the classroom. A program goal is to make science an enjoyable experience while showing students how plasma physics plays an important role in their world. A fusion overview is presented, including topics on energy and environment. Using hands-on equipment, students manipulate plasma discharges using magnetic fields and observe their spectral properties. Students also observe physical properties of liquid nitrogen, infrared waves, and radioactive particles. The benefit of this program, relative to facility tours, is that it optimizes cost and scheduling between the scientific staff and students. This program and its equipment are receiving accolades as an adjunct teaching option available to schools at no cost. This year we have presented to over 1000 students at 11 schools. Student exit interviews reflect strong positive comments regarding their hands-on learning experience and science appreciation.

  12. OGO-1 and OGO-3 MIT plasma experiments S4903

    NASA Technical Reports Server (NTRS)

    1968-01-01

    Plasma proton and plasma electron prototype and flight models were designed, fabricated, and tested. Ground support equipment for the models was also prepared. The flight models were launched aboard the first and third Orbiting Geophysical Observatories on 4 Sept. 1964 and 6 June 1966. These experiments have generally functioned in accordance with the design specifications and useful data are still being received.

  13. Atmosphere, Magnetosphere and Plasmas in Space (AMPS). Spacelab payload definition study. Volume 4, book 1: Labcraft payload general specification

    NASA Technical Reports Server (NTRS)

    1976-01-01

    The performance, design, verification and operational requirements for Labcraft equipment and Labcraft integrated payloads are described. The requirements are based on the current definition of Spacelab and Space Transportation System equipment and the constraints associated with their use.

  14. Scex 3 and Electron Echo 7, a Comparison of Data from Two Rocket Experiments.

    NASA Astrophysics Data System (ADS)

    Bale, Stuart Douglas

    Results from two separate active sounding rocket experiments are presented and discussed. The SCEX III sounding rocket (NASA 39.002 UE) and Electron Echo 7 (NASA 36.015) were both launched from the Poker Flat Research Range (65.1^circ N, 147.5^circ W) near Fairbanks, Alaska, on 1 February, 1990 and 9 February, 1988, respectively. Each payload was equipped with an electron accelerator to study both natural and beam-related plasma phenomena. Data from the SCEX III retarding potential analyzer (RPA) and 3805 A and 3914 A photometers show evidence of a plasma discharge process occurring concomitant with operation of the electron gun. This appears as an enhanced electron current, nonlinear with gun injection current, in the RPA. The photometers register a sharp increase in luminosity during full current electron injection. This luminosity is an indicator of the ionizing electron-neutral collisions which liberate electrons and lead to the cascade-type discharge process. These observations are used to attempt to infer the mechanism of electron acceleration which leads to the discharge process. Before the electron gun was activated, the SCEX III payload flew through a region of auroral activity as evidenced by ground-based all-sky TV and energetic particle flux in the forward payload RPA. During this time, low frequency (10 Hz) electrostatic waves were observed in the DC receivers and Langmuir probe instrument. This data is analyzed, with a cross-spectral technique, and an approximate wave number is inferred. Comparison with theory suggests that the observed wave is the electrostatic ion cyclotron mode (EIC) operating on a heavy ion species (NO or O _2). The Echo 7 nose payload, carrying a plasma wave receiver, was ejected upfield of the main electron gun -equipped payload. Data from the swept frequency analyzer experiment provide wave amplitudes, at frequencies up to 15 MHz, as a function of separation of the main and nose payloads. These observations, and the wave modes inferred, shed light on the wave generation region upfield from a beam-emitting ionospheric payload.

  15. Tethered Satellite System (TSS) core equipment

    NASA Technical Reports Server (NTRS)

    Bonifazi, C.

    1986-01-01

    To date, three Tethered Satellite System (TSS) missions of the Italian provided scientific satellite orbiting in the ionosphere connected to U.S. Space Shuttle is foreseen. The first mission will use an electrically conductive tether of 20 km deployed upward from the orbiter flying at 300 km altitude. This mission will allow investigation of the TSS electrodynamic interaction with the ionosphere due to the high voltage induced across the two terminators of the system during its motion throughout the geomagnetic field. The second mission will use a dielectric tether of 100 km deployed downward from the Orbiter flying at 230 km altitude. Tethered-vehicle access to altitude as low as 120 to 150 km from the Orbiter would permit direct long term observation of phenomena in the lower thermosphere and determination of other dynamical physical processes. The third mission would use the same configuration of the first electrodynamic mission with the complete Core Equipment. Study of power generation by tethered systems would be possible by operating the Core Equipment in the inverted current mode. This mode of operation would allow ion current collection upon the TSS satellite by controlling its potential with respect to the ambient ionospheric plasma. The main requirements of the Core Equipment configuration to date foreseen for the first TSS electrodynamic mission is described. Besides the Core Equipment purposes, its hardware and operational sub-modes of operation are described.

  16. Baffle aperture design study of hollow cathode equipped ion thrusters. M.S. Thesis Technical Report, 1 Dec. 1979 - 1 Oct. 1980

    NASA Technical Reports Server (NTRS)

    Brophy, J. R., Jr.; Wilbur, P. J.

    1980-01-01

    A simple theoretical model which can be used as an aid in the design of the baffle aperture region of a hollow cathode equipped ion thruster was developed. An analysis of the ion and electron currents in both the main and cathode discharge chambers is presented. From this analysis a model of current flow through the aperture, which is required as an input to the design model, was developed. This model was verified experimentally. The dominant force driving electrons through the aperture was the force due to the electrical potential gradient. The diffusion process was modeled according to the Bolm diffusion theory. A number of simplifications were made to limit the amount of detailed plasma information required as input to the model to facilitate the use of the model in thruster design. This simplified model gave remarkably consistant results with experimental results obtained with a given thruster geometry over substantial changes in operating conditions. The model was uncertain to about a factor of two for different thruster cathode region geometries. The design usefulness was limited by this factor of two uncertainty and by the accuracy to which the plasma parameters required as inputs to the model were specified.

  17. Effects of multiple resistive shells and transient electromagnetic torque on the dynamics of mode locking in reversed field pinch plasmas

    NASA Astrophysics Data System (ADS)

    Guo, S. C.; Chu, M. S.

    2002-11-01

    The effects of multiple resistive shells and transient electromagnetic torque on the dynamics of mode locking in the reversed field pinch (RFP) plasmas are studied. Most RFP machines are equipped with one or more metal shells outside of the vacuum vessel. These shells have finite resistivities. The eddy currents induced in each of the shells contribute to the braking electromagnetic (EM) torque which slows down the plasma rotation. In this work we study the electromagnetic torque acting on the plasma (tearing) modes produced by a system of resistive shells. These shells may consist of several nested thin shells or several thin shells enclosed within a thick shell. The dynamics of the plasma mode is investigated by balancing the EM torque from the resistive shells with the plasma viscous torque. Both the steady state theory and the time-dependent theory are developed. The steady state theory is shown to provide an accurate account of the resultant EM torque if (dω/dt)ω-2≪1 and the time scale of interest is much longer than the response (L/R) time of the shell. Otherwise, the transient theory should be adopted. As applications, the steady state theory is used to evaluate the changes of the EM torque response from the resistive shells in two variants of two RFP machines: (1) modification from Reversed Field Experiment (RFX) [Gnesotto et al., Fusion Eng. Des. 25, 335 (1995)] to the modified RFX: both of them are equipped with one thin shell plus one thick shell; (2) modification from Extrap T2 to Extrap T2R [Brunsell et al., Plasma Phys. Controlled Fusion 43, 1457 (2001)]: both of them are equipped with two thin shells. The transient theory has been applied numerically to study the time evolution of the EM torque during the unlocking of a locked tearing mode in the modified RFX.

  18. Efficient barrier for charge injection in polyethylene by silver nanoparticles/plasma polymer stack

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Milliere, L.; Makasheva, K., E-mail: kremena.makasheva@laplace.univ-tlse.fr; Laurent, C.

    2014-09-22

    Charge injection from a metal/insulator contact is a process promoting the formation of space charge in polymeric insulation largely used in thick layers in high voltage equipment. The internal charge perturbs the field distribution and can lead to catastrophic failure either through its electrostatic effects or through energetic processes initiated under charge recombination and/or hot electrons effects. Injection is still ill-described in polymeric insulation due to the complexity of the contact between the polymer chains and the electrodes. Barrier heights derived from the metal work function and the polymer electronic affinity do not provide a good description of the measurementsmore » [Taleb et al., IEEE Trans. Dielectr. Electr. Insul. 20, 311–320 (2013)]. Considering the difficulty to describe the contact properties and the need to prevent charge injection in polymers for high voltage applications, we developed an alternative approach by tailoring the interface properties by the silver nanoparticles (AgNPs)/plasma polymer stack, deposited on the polymer film. Due to their small size, the AgNPs, covered by a very thin film of plasma polymer, act as deep traps for the injected charges thereby stabilizing the interface from the point of view of charge injection. After a quick description of the method for elaborating the nanostructured layer near the contact, it is demonstrated how the AgNPs/plasma polymer stack effectively prevents, in a spectacular way, the formation of bulk space charge.« less

  19. Advanced electric propulsion and space plasma contactor research

    NASA Technical Reports Server (NTRS)

    Wilbur, Paul J.

    1987-01-01

    A theory of the plasma contacting process is described and experimental results obtained using three different hollow cathode-based plasma contactors are presented. The existence of a sheath across which the bulk of the voltage drop associated with the contacting process occurs is demonstrated. Test results are shown to agree with a model of a spherical, space-charge-limited double sheath. The concept of ignited mode contactor operation is discussed, which is shown to enhance contactor efficiency when it is collecting electrons. An investigation of the potentials in the plasma plumes downstream of contactors operating at typical conditions is presented. Results of tests performed on hollow cathodes operating at high interelectrode pressures (up to about 1000 Torr) on ammonia are presented and criteria that are necessary to ensure that the cathode will operate properly in this regime are presented. These results suggest that high pressure hollow cathode operation is difficult to achieve and that special care must be taken to assure that the electron emission region remains diffuse and attached to the low work function insert. Experiments conducted to verify results obtained previously using a ring cusp ion source equipped with a moveable anode are described and test results are reported. A theoretical study of hollow cathode operation at high electron emission currents is presented. Preliminary experiments using the constrained sheath optics concept to achieve ion extraction under conditions of high beam current density, low net accelerating voltage and well columniated beamlet formation are discussed.

  20. Development of atmospheric pressure large area plasma jet for sterilisation and investigation of molecule and plasma interaction

    NASA Astrophysics Data System (ADS)

    Zerbe, Kristina; Iberler, Marcus; Jacoby, Joachim; Wagner, Christopher

    2016-09-01

    The intention of the project is the development and improvement of an atmospheric plasma jet based on various discharge forms (e.g. DBD, RF, micro-array) for sterilisation of biomedical equipment and investigation of biomolecules under the influence of plasma stress. The major objective is to design a plasma jet with a large area and an extended length. Due to the success on small scale plasma sterilisation the request of large area plasma has increased. Many applications of chemical disinfection in environmental and medical cleaning could thereby be complemented. Subsequently, the interaction between plasma and biomolecules should be investigated to improve plasma strerilisation. Special interest will be on non equilibrium plasma electrons affecting the chemical bindings of organic molecules.

  1. Mechanical properties of nitrogen-rich surface layers on SS304 treated by plasma immersion ion implantation

    NASA Astrophysics Data System (ADS)

    Fernandes, B. B.; Mändl, S.; Oliveira, R. M.; Ueda, M.

    2014-08-01

    The formation of hard and wear resistant surface regions for austenitic stainless steel through different nitriding and nitrogen implantation processes at intermediate temperatures is an established technology. As the inserted nitrogen remains in solid solution, an expanded austenite phase is formed, accounting for these surface improvements. However, experiments on long-term behavior and exact wear processes within the expanded austenite layer are still missing. Here, the modified layers were produced using plasma immersion ion implantation with nitrogen gas and had a thickness of up to 4 μm, depending on the processing temperature. Thicker layers or those with higher surface nitrogen contents presented better wear resistance, according to detailed microscopic investigation on abrasion, plastic deformation, cracking and redeposition of material inside the wear tracks. At the same time, cyclic fatigue testing employing a nanoindenter equipped with a diamond ball was carried out at different absolute loads and relative unloadings. As the stress distribution between the modified layer and the substrate changes with increasing load, additional simulations were performed for obtaining these complex stress distributions. While high nitrogen concentration and/or thicker layers improve the wear resistance and hardness, these modifications simultaneously reduce the surface fatigue resistance.

  2. Resolving critical dimension drift over time in plasma etching through virtual metrology based wafer-to-wafer control

    NASA Astrophysics Data System (ADS)

    Lee, Ho Ki; Baek, Kye Hyun; Shin, Kyoungsub

    2017-06-01

    As semiconductor devices are scaled down to sub-20 nm, process window of plasma etching gets extremely small so that process drift or shift becomes more significant. This study addresses one of typical process drift issues caused by consumable parts erosion over time and provides feasible solution by using virtual metrology (VM) based wafer-to-wafer control. Since erosion of a shower head has center-to-edge area dependency, critical dimensions (CDs) at the wafer center and edge area get reversed over time. That CD trend is successfully estimated on a wafer-to-wafer basis by a partial least square (PLS) model which combines variables from optical emission spectroscopy (OES), VI-probe and equipment state gauges. R 2 of the PLS model reaches 0.89 and its prediction performance is confirmed in a mass production line. As a result, the model can be exploited as a VM for wafer-to-wafer control. With the VM, advanced process control (APC) strategy is implemented to solve the CD drift. Three σ of CD across wafer is improved from the range (1.3-2.9 nm) to the range (0.79-1.7 nm). Hopefully, results introduced in this paper will contribute to accelerating implementation of VM based APC strategy in semiconductor industry.

  3. Efficiency of plasma actuator ionization in shock wave modification in a rarefied supersonic flow over a flat plate

    NASA Astrophysics Data System (ADS)

    Joussot, Romain; Lago, Viviana; Parisse, Jean-Denis

    2014-12-01

    This paper describes experimental and numerical investigations focused on the shock wave modification, induced by a dc glow discharge, of a Mach 2 flow under rarefied regime. The model under investigation is a flat plate equipped with a plasma actuator composed of two electrodes. The glow discharge is generated by applying a negative potential to the upstream electrode, enabling the creation of a weakly ionized plasma. The natural flow (i.e. without the plasma) exhibits a thick laminar boundary layer and a shock wave with a hyperbolic shape. Images of the flow obtained with an ICCD camera revealed that the plasma discharge induces an increase in the shock wave angle. Thermal effects (volumetric, and at the surface) and plasma effects (ionization, and thermal non-equilibrium) are the most relevant processes explaining the observed modifications. The effect induced by the heating of the flat plate surface is studied experimentally by replacing the upstream electrode by a heating element, and numerically by modifying the thermal boundary condition of the model surface. The results show that for a similar temperature distribution over the plate surface, modifications induced by the heating element are lower than those produced by the plasma. This difference shows that other effects than purely thermal effects are involved with the plasma actuator. Measurements of the electron density with a Langmuir probe highlight the fact that the ionization degree plays an important role into the modification of the flow. The gas properties, especially the isentropic exponent, are indeed modified by the plasma above the actuator and upstream the flat plate. This leads to a local modification of the flow conditions, inducing an increase in the shock wave angle.

  4. Modernized active spectroscopic diagnostics (CXRS) of the T-10 tokamak

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Krupin, V. A., E-mail: Krupin-VA@nrcki.ru; Klyuchnikov, L. A., E-mail: Lklyuchnikov@list.ru; Korobov, K. V., E-mail: Korobov-KV@nrcki.ru

    2015-12-15

    This work presents the results of modernization of the CXRS (charge exchange recombination spectroscopy) diagnostics [1] at the T-10 tokamak. The relevance of this work is due to the importance of measurements of the ion temperature and nuclei density of the working gas and impurities for analysis of transport processes in the plasma ion component. Measurements of radial profiles of the ion temperature are extremely important for investigating the geodesic acoustic mode behavior which is conducted at the T-10 [2]. The modernized scheme of CXRS measurements, as well as the design and operational features of the spectrometer created for themore » new diagnostics, is described. Principles of data recording and further processing are considered in detail; attention is given to the problem of calibration of the whole complex of equipment. The performed changes in diagnostics allow the measurements to be taken simultaneously in three spectral intervals: in the region of the beam line H{sub α}, the CXRS line of carbon ion C{sup 5+}, and the CXRS line of one of the hydrogen-like ions: He{sup 1+}, Li{sup 2+}, N{sup 6+}, O{sup 7+} or Ne{sup 9+}. This makes it possible to measure the density profiles of two plasma impurities simultaneously, as well as the ion temperature from CXRS lines of different elements. The modernized diagnostics significantly broadens the possibilities of studying the physics of transport processes and quasi-coherent modes of plasma oscillations at the T-10.« less

  5. The role and application of ion beam analysis for studies of plasma-facing components in controlled fusion devices

    NASA Astrophysics Data System (ADS)

    Rubel, Marek; Petersson, Per; Alves, Eduardo; Brezinsek, Sebastijan; Coad, Joseph Paul; Heinola, Kalle; Mayer, Matej; Widdowson, Anna

    2016-03-01

    First wall materials in controlled fusion devices undergo serious modification by several physical and chemical processes arising from plasma-wall interactions. Detailed information is required for the assessment of material lifetime and accumulation of hydrogen isotopes in wall materials. The intention of this work is to give a concise overview of key issues in the characterization of plasma-facing materials and components in tokamaks, especially in JET with an ITER-Like Wall. IBA techniques play a particularly prominent role here because of their isotope selectivity in the low-Z range (1-10), high sensitivity and combination of several methods in a single run. The role of 3He-based NRA, RBS (standard and micro-size beam) and HIERDA in fuel retention and material migration studies is presented. The use of tracer techniques with rare isotopes (e.g. 15N) or marker layers on wall diagnostic components is described. Special instrumentation, development of equipment to enhance research capabilities and issues in handling of contaminated materials are addressed.

  6. An Overview of Scientific and Space Weather Results from the Communication/Navigation Outage Forecasting System (C/NOFS) Mission

    NASA Technical Reports Server (NTRS)

    Pfaff, R.; de la Beaujardiere, O.; Hunton, D.; Heelis, R.; Earle, G.; Strauss, P.; Bernhardt, P.

    2012-01-01

    The Communication/Navigation Outage Forecasting System (C/NOFS) Mission of the Air Force Research Laboratory is described. C/NOFS science objectives may be organized into three categories: (1) to understand physical processes active in the background ionosphere and thermosphere in which plasma instabilities grow; (2) to identify mechanisms that trigger or quench the plasma irregularities responsible for signal degradation; and (3) to determine how the plasma irregularities affect the propagation of electromagnetic waves. The satellite was launched in April, 2008 into a low inclination (13 deg), elliptical (400 x 850 km) orbit. The satellite sensors measure the following parameters in situ: ambient and fluctuating electron densities, AC and DC electric and magnetic fields, ion drifts and large scale ion composition, ion and electron temperatures, and neutral winds. C/NOFS is also equipped with a GPS occultation receiver and a radio beacon. In addition to the satellite sensors, complementary ground-based measurements, theory, and advanced modeling techniques are also important parts of the mission. We report scientific and space weather highlights of the mission after nearly four years in orbit

  7. Nano-Disperse Borides and Carbides: Plasma Technology Production, Specific Properties, Economic Evaluation

    NASA Astrophysics Data System (ADS)

    Galevskii, G. V.; Rudneva, V. V.; Galevskii, S. G.; Tomas, K. I.; Zubkov, M. S.

    2016-04-01

    The experience of production and study on properties of nano-disperse chromium and titanium borides and carbides, and silicon carbide has been generalized. The structure and special service aspects of utilized plasma-metallurgical complex equipped with a three-jet direct-flow reactor with a capacity of 150 kW have been outlined. Processing, heat engineering and service life characteristics of the reactor are specified. The synthesis parameters of borides and carbides, as well as their basic characteristics in nano-disperse condition and their production flow diagram are outlined. Engineering and economic performance of synthesizing borides in laboratory and industrial conditions is assessed, and the respective segment of the international market as well. The work is performed at State Siberian Industrial University as a project part of the State Order of Ministry of Science and Education of the Russian Federation No. 11.1531/2014/K.

  8. Corrosion behaviors and effects of corrosion products of plasma electrolytic oxidation coated AZ31 magnesium alloy under the salt spray corrosion test

    NASA Astrophysics Data System (ADS)

    Wang, Yan; Huang, Zhiquan; Yan, Qin; Liu, Chen; Liu, Peng; Zhang, Yi; Guo, Changhong; Jiang, Guirong; Shen, Dejiu

    2016-08-01

    The effects of corrosion products on corrosion behaviors of AZ31 magnesium alloy with a plasma electrolytic oxidation (PEO) coating were investigated under the salt spray corrosion test (SSCT). The surface morphology, cross-sectional microstructure, chemical and phase compositions of the PEO coating were determined using scanning electron microscopy (SEM) equipped with energy dispersive X-ray spectroscopy (EDS) and X-ray diffraction analysis (XRD), respectively. Further, the corrosion process of the samples under the SSCT was examined in a non-aqueous electrolyte (methanol) using electrochemical impedance spectroscopy (EIS) coupled with equivalent circuit. The results show that the inner layer of the coating was destroyed firstly and the corrosion products have significant effects on the corrosion behaviors of the coating. The results above are discussed and an electrochemical corrosion model is proposed in the paper.

  9. FOREWORD: 7th Symposium on Vacuum-based Science and Technology (SVBST2013)

    NASA Astrophysics Data System (ADS)

    Gulbiński, W.

    2014-11-01

    These are the proceedings of the 7th Symposium on Vacuum based Science and Technology organized in Kołobrzeg (PL) on November 19-21, 2013 by the Institute of Technology and Education, Koszalin University of Technology and the Clausius Tower Society under auspices of the Polish Vacuum Society (PTP) and the German Vacuum Society (DVG) and in collaboration with the BalticNet PlasmaTec and the Society of Vacuum Coaters (SVC). It was accompanied by the 12-th Annual Meeting of the German Vacuum Society. The mission of the Symposium is to provide a forum for presentation and exchange of expertise and research results in the field of vacuum and plasma science. After already six successful meetings organized alternately in Poland and Germany our goal is to continue and foster cooperation within the vacuum and plasma science community. This year, the Rudolf-Jaeckel Prize, awarded by the DVG for outstanding achievements in the field of vacuum based sciences, was presented to Dr Ute Bergner, president of the VACOM Vakuum Komponenten & Messtechnik GmbH and a member of our community. The full-day course organized in the framework of the Educational Program by the Society of Vacuum Coaters (SVC) and entitled: An Introduction to Physical Vapor Deposition (PVD) Processes was held on November 18, 2013 as a satellite event of the Symposium. The instructor was Prof. Ismat Shah from Delaware University (US). The Clausius Session, already traditionally organized during the Symposium was addressed this year to young generation. We invited our young colleagues to attend a series of educational lectures reporting on achievements in graphene science, scanning probe microscopy and plasma science. Lectures were given by: Prof. Jacek Baranowski from the Institute of Electronic Materials Technology in Warsaw, Prof. Teodor Gotszalk from the Wroclaw University of Technology and Prof. Holger Kersten from the Christian Albrechts University in Kiel. The Symposium was accompanied by an industry exhibition attended by the representatives of leading companies offering vacuum equipment, complete solutions for plasma based technology as well as advanced research equipment. Witold Gulbiński Michael Kopnarski Frank Richter Jan Walkowicz

  10. Electromagnetic radiation generated by arcing in low density plasma

    NASA Technical Reports Server (NTRS)

    Vayner, Boris V.; Ferguson, Dale C.; Snyder, David B.; Doreswamy, C. V.

    1996-01-01

    An unavoidable step in the process of space exploration is to use high-power, very large spacecraft launched into Earth orbit. Obviously, the spacecraft will need powerful energy sources. Previous experience has shown that electrical discharges occur on the surfaces of a high-voltage array, and these discharges (arcs) are undesirable in many respects. Moreover, any high voltage conductor will interact with the surrounding plasma, and that interaction may result in electrical discharges between the conductor and plasma (or between two conductors with different potentials, for example, during docking and extravehicular activity). One very important aspect is the generation of electromagnetic radiation by arcing. To prevent the negative influence of electromagnetic noise on the operation of spacecraft systems, it seems necessary to determine the spectra and absolute levels of the radiation, and to determine limitations on the solar array bias voltage that depend on the parameters of LEO plasma and the technical requirements of the spacecraft equipment. This report describes the results of an experimental study and computer simulation of the electromagnetic radiation generated by arcing on spacecraft surfaces. A large set of high quality data was obtained during the Solar Array Module Plasma Interaction Experiment (SAMPIE, flight STS-62) and ground test. These data include the amplitudes of current, pulse forms, duration of each arc, and spectra of plasma waves. A theoretical explanation of the observed features is presented in this report too. The elaborated model allows us to determine the parameters of the electromagnetic noise for different frequency ranges, distances from the arcing site, and distinct kinds of plasma waves.

  11. A Computational Chemistry Database for Semiconductor Processing

    NASA Technical Reports Server (NTRS)

    Jaffe, R.; Meyyappan, M.; Arnold, J. O. (Technical Monitor)

    1998-01-01

    The concept of 'virtual reactor' or 'virtual prototyping' has received much attention recently in the semiconductor industry. Commercial codes to simulate thermal CVD and plasma processes have become available to aid in equipment and process design efforts, The virtual prototyping effort would go nowhere if codes do not come with a reliable database of chemical and physical properties of gases involved in semiconductor processing. Commercial code vendors have no capabilities to generate such a database, rather leave the task to the user of finding whatever is needed. While individual investigations of interesting chemical systems continue at Universities, there has not been any large scale effort to create a database. In this presentation, we outline our efforts in this area. Our effort focuses on the following five areas: 1. Thermal CVD reaction mechanism and rate constants. 2. Thermochemical properties. 3. Transport properties.4. Electron-molecule collision cross sections. and 5. Gas-surface interactions.

  12. Overview Of Dry-Etch Techniques

    NASA Astrophysics Data System (ADS)

    Salzer, John M.

    1986-08-01

    With pattern dimensions shrinking, dry methods of etching providing controllable degrees of anisotropy become a necessity. A number of different configurations of equipment - inline, hex, planar, barrel - have been offered, and within each type, there are numerous significant variations. Further, each specific type of machine must be perfected over a complex, interactive parameter space to achieve suitable removal of various materials. Among the most critical system parameters are the choice of cathode or anode to hold the wafers, the chamber pressure, the plasma excitation frequency, and the electrode and magnetron structures. Recent trends include the use of vacuum load locks, multiple chambers, multiple electrodes, downstream etching or stripping, and multistep processes. A major percentage of etches in production handle the three materials: polysilicon, oxide and aluminum. Recent process developments have targeted refractory metals, their silicides, and with increasing emphasis, silicon trenching. Indeed, with new VLSI structures, silicon trenching has become the process of greatest interest. For stripping, dry processes provide advantages other than anisotropy. Here, too, new configurations and methods have been introduced recently. While wet processes are less than desirable from a number of viewpoints (handling, safety, disposal, venting, classes of clean room, automatability), dry methods are still being perfected as a direct, universal replacement. The paper will give an overview of these machine structures and process solutions, together with examples of interest. These findings and the trends discussed are based on semiannual survey of manufacturers and users of the various types of equipment.

  13. Plasma Cutting and Carbon-Arc Cutting. Welding Module 8. Instructor's Guide.

    ERIC Educational Resources Information Center

    Missouri Univ., Columbia. Instructional Materials Lab.

    This guide is intended to assist vocational educators in teaching the two units of a module in operating plasma cutting and carbon-arc cutting equipment. The module is part of a welding curriculum that has been designed to be totally integrated with Missouri's Vocational Instruction Management System. The materials included in the module have been…

  14. Plasma cholinesterase activity of rats, western grey kangaroos, alpacas, sheep, cattle, and horses.

    PubMed

    Mayberry, Chris; Mawson, Peter; Maloney, Shane K

    2015-01-01

    Plasma cholinesterase activity levels of various species may be of interest to toxicologists or pathologists working with chemicals that interfere with the activity of plasma cholinesterase. We used a pH titration method to measure the plasma cholinesterase activity of six mammalian species. Plasma cholinesterase activity varied up to 50-fold between species: sheep (88 ± 45 nM acetylcholine degraded per ml of test plasma per minute), cattle (94 ± 35), western grey kangaroos (126 ± 92), alpaca (364 ± 70), rats (390 ± 118) and horses (4539 ± 721). We present a simple, effective technique for the assay of plasma cholinesterase activity levels from a range of species. Although labour-intensive, it requires only basic laboratory equipment. Copyright © 2015 Elsevier Inc. All rights reserved.

  15. Sterilization of bacterial endospores by an atmospheric-pressure argon plasma jet

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Uhm, Han S.; Lim, Jin P.; Li, Shou Z.

    2007-06-25

    Argon plasma jets penetrate deep into ambient air and create a path for oxygen radicals to sterilize microbes. A sterilization experiment with bacterial endospores indicates that an argon-oxygen plasma jet very effectively kills endospores of Bacillus atrophaeus (ATCC 9372), thereby demonstrating its capability to clean surfaces and its usefulness for reinstating contaminated equipment as free from toxic biological warfare agents. However, the spore-killing efficiency of the atmospheric-pressure argon-oxygen jet depends very sensitively on the oxygen concentration in the argon gas.

  16. Inductively-Coupled RF Powered O2 Plasma as a Sterilization Source

    NASA Technical Reports Server (NTRS)

    Sharma, S. P.; Rao, M. V. V. S.; Cruden, B. A.; Meyyappan, M.; Mogul, R.; Khare, B.; Chan, S. L.; Arnold, James O. (Technical Monitor)

    2001-01-01

    Low-temperature or cold plasmas have been shown to be effective for the sterilization of sensitive medical devices and electronic equipment. Low-temperature plasma sterilization procedures possess certain advantages over other protocols such as ethylene oxide, gamma radiation, and heat due to the use of inexpensive reagents, the insignificant environmental impacts and the low energy requirements. In addition, plasmas may also be more efficacious in the removal of robust microorganisms due to their higher chemical reactivity. Together, these attributes render cold plasma sterilization as ideal for the surface decontamination requirements for NASA Planetary Protection. Hence, the work described in this study involves the construction, characterization, and application of an inductively-coupled, RF powered oxygen (O2) plasma.

  17. ROY—A multiscale magnetospheric mission

    NASA Astrophysics Data System (ADS)

    Savin, S.; Zelenyi, L.; Amata, E.; Budaev, V.; Buechner, J.; Blecki, J.; Balikhin, M.; Klimov, S.; Korepanov, V. E.; Kozak, L.; Kudryashov, V.; Kunitsyn, V.; Lezhen, L.; Milovanov, A. V.; Nemecek, Z.; Nesterov, I.; Novikov, D.; Panov, E.; Rauch, J. L.; Rothkaehl, H.; Romanov, S.; Safrankova, J.; Skalsky, A.; Veselov, M.

    2011-05-01

    The scientific rationale of the ROY multi-satellite mission addresses multiscale investigations of plasma processes in the key magnetospheric regions with strong plasma gradients, turbulence and magnetic field annihilation in the range from electron inertial length to MHD scales. The main scientific aims of ROY mission include explorations of: turbulence on a non-uniform background as a keystone for transport processes; structures and jets in plasma flows associated with anomalously large concentration of kinetic energy; their impact on the energy balance and boundary formation; transport barriers: plasma separation and mixing, Alfvenic collapse of magnetic field lines and turbulent dissipation of kinetic energy; self-organized versus forced reconnection of magnetic field lines; collisionless shocks, plasma discontinuities and associated particle acceleration processes. In the case of autonomous operation, 4 mobile spacecrafts of about 200 kg mass with 60 kg payload equipped with electro-reactive plasma engines will provide 3D measurements at the scales of 100-10000 km and simultaneous 1D measurements at the scales 10-1000 km. The latter smaller scales will be scanned with the use of radio-tomography (phase-shift density measurements within the cone composed of 1 emitting and 3 receiving spacecrafts). We also discuss different opportunities for extra measurement points inside the ROY mission for simultaneous measurements at up to 3 scales for the common international fleet. Combined influence of intermittent turbulence and reconnection on the geomagnetic tail and on the nonlinear dynamics of boundary layers will be explored in situ with fast techniques including particle devices under development, providing plasma moments down to 30 ms resolution. We propose different options for joint measurements in conjunction with the SCOPE and other missions: simultaneous sampling of low- and high-latitudes magnetopause, bow shock and geomagnetic tail at the same local time; tracing of magnetosheath streamlines from the bow shock to near-Earth geomagnetic tail; passing "through" the SCOPE on the inbound orbit leg; common measurements (with SCOPE and other equatorial spacecraft) at distances of ˜ few thousand km for durations of ˜several hours per orbit. The orbit options and scientific payload of possible common interest are discussed in this work, including FREGAT cargo opportunities for extra payload launching and the "Swarm" campaigns with ejection of nano- and pico-satellites.

  18. Cold plasma rapid decontamination of food contact surfaces contaminated with Salmonella biofilms.

    PubMed

    Niemira, Brendan A; Boyd, Glenn; Sites, Joseph

    2014-05-01

    Cross-contamination of foods from persistent pathogen reservoirs is a known risk factor in processing environments. Industry requires a rapid, waterless, zero-contact, chemical-free method for removing pathogens from food contact surfaces. Cold plasma was tested for its ability to inactivate Salmonella biofilms. A 3-strain Salmonella culture was grown to form adherent biofilms for 24, 48, or 72 h on a test surface (glass slides). These were placed on a conveyor belt and passed at various line speeds to provide exposure times of 5, 10, or 15 s. The test plate was either 5 or 7.5 cm under a plasma jet emitter operating at 1 atm using filtered air as the feed gas. The frequency of high-voltage electricity was varied from 23 to 48 kHz. At the closer spacing (5 cm), cold plasma reduced Salmonella biofilms by up to 1.57 log CFU/mL (5 s), 1.82 log CFU/mL (10 s), and 2.13 log CFU/mL (15 s). Increasing the distance to 7.5 cm generally reduced the efficacy of the 15 s treatment, but had variable effects on the 5 and 10 s treatments. Variation of the high-voltage electricity had a greater effect on 10 and 15 s treatments, particularly at the 7.5 cm spacing. For each combination of time, distance, and frequency, Salmonella biofilms of 24, 48, and 72 h growth responded consistently with each other. The results show that short treatments with cold plasma yielded up to a 2.13 log reduction of a durable form of Salmonella contamination on a model food contact surface. This technology shows promise as a possible tool for rapid disinfection of materials associated with food processing. Pathogens such as Salmonella can form chemical-resistant biofilms, making them difficult to remove from food contact surfaces. A 15 s treatment with cold plasma reduced mature Salmonella biofilms by up to 2.13 log CFU/mL (99.3%). This contact-free, waterless method uses no chemical sanitizers. Cold plasma may therefore have a practical application for conveyor belts, equipment, and other food contact surfaces where a rapid, dry antimicrobial process is required. © 2014 Institute of Food Technologists®

  19. Aerosol emission monitoring in the production of silicon carbide nanoparticles by induction plasma synthesis

    NASA Astrophysics Data System (ADS)

    Thompson, Drew; Leparoux, Marc; Jaeggi, Christian; Buha, Jelena; Pui, David Y. H.; Wang, Jing

    2013-12-01

    In this study, the synthesis of silicon carbide (SiC) nanoparticles in a prototype inductively coupled thermal plasma reactor and other supporting processes, such as the handling of precursor material, the collection of nanoparticles, and the cleaning of equipment, were monitored for particle emissions and potential worker exposure. The purpose of this study was to evaluate the effectiveness of engineering controls and best practice guidelines developed for the production and handling of nanoparticles, identify processes which result in a nanoparticle release, characterize these releases, and suggest possible administrative or engineering controls which may eliminate or control the exposure source. No particle release was detected during the synthesis and collection of SiC nanoparticles and the cleaning of the reactor. This was attributed to most of these processes occurring in closed systems operated at slight underpressure. Other tasks occurring in more open spaces, such as the disconnection of a filter assembly from the reactor system and the use of compressed air for the cleaning of filters where synthesized SiC nanoparticles were collected, resulted in releases of submicrometer particles with a mode size of 170-180 nm. Observation of filter samples under scanning electron microscope confirmed that the particles were agglomerates of SiC nanoparticles.

  20. A New Experimental System Design Related to the Plasma State

    ERIC Educational Resources Information Center

    Korkmaz, S. D.

    2015-01-01

    The plasma state is included in the unit on matter and its properties in the 9th grade Physics course secondary school curriculum prepared by the Ministry of National Education of Turkey. Any tools and equipment required by tests to be conducted in the scope of the Physics course curriculum are in general easily accessible. However, in cases in…

  1. Synthesis of Carbon Nanotubes in Thermal Plasma Reactor at Atmospheric Pressure.

    PubMed

    Szymanski, Lukasz; Kolacinski, Zbigniew; Wiak, Slawomir; Raniszewski, Grzegorz; Pietrzak, Lukasz

    2017-02-18

    In this paper, a novel approach to the synthesis of the carbon nanotubes (CNTs) in reactors operating at atmospheric pressure is presented. Based on the literature and our own research results, the most effective methods of CNT synthesis are investigated. Then, careful selection of reagents for the synthesis process is shown. Thanks to the performed calculations, an optimum composition of gases and the temperature for successful CNT synthesis in the CVD (chemical vapor deposition) process can be chosen. The results, having practical significance, may lead to an improvement of nanomaterials synthesis technology. The study can be used to produce CNTs for electrical and electronic equipment (i.e., supercapacitors or cooling radiators). There is also a possibility of using them in medicine for cancer diagnostics and therapy.

  2. [The vision of welders in France].

    PubMed

    Boissin, J P; Peyresblanques, J; Rollin, J P; Marini, F; Beaufils, D

    2002-10-01

    A study was conducted to measure the impact of welding on the vision of welders. This study was conducted in France by the occupational medicine staff of large companies on 1.131 people, namely 850 welders and 281 control subjects. This investigation included two examinations at the beginning and the end of a year. The investigative procedure examined the different welding processes, the percentage of working time spent on welding activity, the length of exposure in years, as well as the medical variables: the optical correction type and history of ocular traumatology. The Visiotest or the Ergovision were used for the visual examination, equipment in common use by occupational medicine departments. The welders were comparatively young (59.53% of them were less than 45 years old). Moreover, for 69.75% of the welders, more than 75% of their activity was devoted to welding. All currently used welding processes were represented, including the modern PLASMA-TIG welding process. No excessive blood alcohol levels were observed in all subjects, but welders did smoke slightly more than the control subjects (40% vs 33%). Self-medication was rather less frequent among the welders, except as regards the use of eye drops, where the proportions were clearly inverted. Optical correction for hyperopia was similar between the two groups; however, as regards myopia, the welders were corrected less often. Lastly, contact lens use was exceptional among the welders. Nearsightedness varied logically with age, but also, inexplicably, with the welding processes. Vision recovery time after exposure to glare was much longer among the welders, except for the PLASMA-TIG processes. No difference was observed in the other parameters of the study. No change in the visual functions studied was noted between the two examinations. The examination techniques used showed no impairment of the studied visual functions, probably because companies use protective and preventive eye care methods. Moreover this study is the first to examine the type of welding used by workers and particularly the modern PLASMA-TIG process. The vision recovery time after exposure to glare seems better for the PLASMA-TIG process may be the result of the lower luminous intensity of this process. This study was conducted for preventive purposes to contribute to better monitoring of safety and comfort for welding workers and has shown no alteration of the visual function among welders in general.

  3. Fully non-inductive second harmonic electron cyclotron plasma ramp-up in the QUEST spherical tokamak

    NASA Astrophysics Data System (ADS)

    Idei, H.; Kariya, T.; Imai, T.; Mishra, K.; Onchi, T.; Watanabe, O.; Zushi, H.; Hanada, K.; Qian, J.; Ejiri, A.; Alam, M. M.; Nakamura, K.; Fujisawa, A.; Nagashima, Y.; Hasegawa, M.; Matsuoka, K.; Fukuyama, A.; Kubo, S.; Shimozuma, T.; Yoshikawa, M.; Sakamoto, M.; Kawasaki, S.; Nakashima, H.; Higashijima, A.; Ide, S.; Maekawa, T.; Takase, Y.; Toi, K.

    2017-12-01

    Fully non-inductive second (2nd) harmonic electron cyclotron (EC) plasma current ramp-up was demonstrated with a newlly developed 28 GHz system in the QUEST spherical tokamak. A high plasma current of 54 kA was non-inductively ramped up and sustained stably for 0.9 s with a 270 kW 28 GHz wave. A higher plasma current of 66 kA was also non-inductively achieved with a slow ramp-up of the vertical field. We have achieved a significantly higher plasma current than those achieved previously with the 2nd harmonic EC waves. This fully non-inductive 2nd harmonic EC plasma ramp-up method might be useful for future burning plasma devices and fusion reactors, in particular for operations at half magnetic field with the same EC heating equipment.

  4. Plasma arc torch with coaxial wire feed

    DOEpatents

    Hooper, Frederick M

    2002-01-01

    A plasma arc welding apparatus having a coaxial wire feed. The apparatus includes a plasma arc welding torch, a wire guide disposed coaxially inside of the plasma arc welding torch, and a hollow non-consumable electrode. The coaxial wire guide feeds non-electrified filler wire through the tip of the hollow non-consumable electrode during plasma arc welding. Non-electrified filler wires as small as 0.010 inches can be used. This invention allows precision control of the positioning and feeding of the filler wire during plasma arc welding. Since the non-electrified filler wire is fed coaxially through the center of the plasma arc torch's electrode and nozzle, the wire is automatically aimed at the optimum point in the weld zone. Therefore, there is no need for additional equipment to position and feed the filler wire from the side before or during welding.

  5. Differentiation of Staphylococcus aureus from freshly slaughtered poultry and strains 'endemic' to processing plants by biochemical and physiological tests.

    PubMed

    Mead, G C; Norris, A P; Bratchell, N

    1989-02-01

    A comparison was made of 27 'endemic' strains of Staphylococcus aureus and 35 strains from freshly slaughtered birds, isolated at five commercial slaughterhouses processing chickens or turkeys. Of 112 biochemical and physiological tests used, 74 gave results which differed among the strains. Cluster analysis revealed several distinct groupings which were influenced by strain type, processing plant and bird origin; these included a single group at the 72% level of similarity containing most of the 'endemic' strains. In comparison with strains from freshly slaughtered birds, a higher proportion of 'endemic' strains produced fibrinolysin, alpha-glucosidase and urease and were beta-haemolytic on sheep-blood agar. The 'endemic' type also showed a greater tendency to coagulate human but not bovine plasma, and to produce mucoid growth and clumping. The last two properties, relevant to colonization of processing equipment, were less evident in heart infusion broth than in richer media or process water collected during defeathering of the birds.

  6. Probe manipulators for Wendelstein 7-X and their interaction with the magnetic topology

    NASA Astrophysics Data System (ADS)

    M, RACK; D, HÖSCHEN; D, REITER; B, UNTERBERG; J, W. COENEN; S, BREZINSEK; O, NEUBAUER; S, BOZHENKOV; G, CZYMEK; Y, LIANG; M, HUBENY; Ch, LINSMEIER; the Wendelstein 7-X Team

    2018-05-01

    Probe manipulators are a versatile addition to typical plasma edge diagnostics. Equipped with material samples they allow for detailed investigation of plasma–wall interaction processes, such as material erosion, deposition or impurity transport pathways. When combined with electrical probes, a study of scrape-off layer and plasma edge density, temperature and flow profiles as well as magnetic topologies is possible. A mid-plane manipulator is already in operation on Wendelstein 7-X. A system in the divertor region is currently under development. In the present paper we discuss the critical issue of heat and power loads, power redistribution and experimental access to the complex magnetic topology of Wendelstein 7-X. All the aforementioned aspects are of relevance for the design and operation of a probe manipulator in a device like Wendelstein 7-X. A focus is put on the topological region that is accessible for the different coil current configurations at Wendelstein 7-X and the power load on the manipulator with respect to the resulting different magnetic configurations. Qualitative analysis of power loads on plasma-facing components is performed using a numerical tracer particle diffusion tool provided via the Wendelstein 7-X Webservices.

  7. CF2 Detection in Radio-Frequency Ar/CHF3 Plasmas by Fourier Transform Infrared Spectroscopy

    NASA Technical Reports Server (NTRS)

    Kim, J. S.; Rao, M. V. V. S.; Cappelli, M. A.; Sharma, S. P.

    1999-01-01

    CFx radicals, in particular CF2, are instrumental in anisotropic etching of SiO2. In order to optimize the CFx radical population in a given process environment, it is imperative that we understand their production mechanism. Towards this goal, we have conducted a series of quantitative measurements of CF2 radicals in low pressure RF plasmas similar to those used in SiO2 etching. In this study, we present preliminary results for Ar/CHF3 plasmas operating at pressures ranging from 10-50 mTorr and powers ranging from 100-500 W in the GEC reference cell, modified for inductive (transformer) coupling. Fourier transform infrared (FTIR) spectroscop) is used to observe the absorption features of the CF2 radical in the 1114 cm-1 and 1096 cm-1 spectral regions. The FTIR spectrometer is equipped with a high-sensitivity mercury cadmium telluride (MCT) detector and has afixed resolution of 0.125 cm- 1. The CF2 concentrations are measured for a range of operating pressures and discharge power levels, and are compared to measurements of the relative CF2 concentrations made by mass spectrometry using the method of appearance potential for radical selectivity.

  8. Environmental and economic vision of plasma treatment of waste in Makkah

    NASA Astrophysics Data System (ADS)

    Galaly, Ahmed Rida; van Oost, Guido

    2017-10-01

    An environmental and economic assessment of the development of a plasma-chemical reactor equipped with plasma torches for the environmentally friendly treatment of waste streams by plasma is outlined with a view to the chemical and energetic valorization of the sustainability in the Kingdom of Saudi Arabia (KSA). This is especially applicable in the pilgrimage season in the city of Makkah, which is a major challenge since the amount of waste was estimated at about 750 thousand tons through Arabic Year 1435H (2015), and is growing at a rate of 3%-5% annually. According to statistics, the value of waste in Saudi Arabia ranges between 8 and 9 billion EUR. The Plasma-Treatment Project (PTP) encompasses the direct plasma treatment of all types of waste (from source and landfill), as well as an environmental vision and economic evaluation of the use of the gas produced for fuel and electricity production in KSA, especially in the pilgrimage season in the holy city Makkah. The electrical power required for the plasma-treatment process is estimated at 5000 kW (2000 kW used for the operation of the system and 3000 kW sold), taking into account the fact that: (1) the processing capacity of solid waste is 100 tons per day (2) and the sale of electricity amounts to 23.8 MW at 0.18 EUR per kWh. (3) The profit from the sale of electricity per year is estimated at 3.27 million EUR and the estimated profit of solid-waste treatment amounts to 6 million EUR per year and (4) the gross profit per ton of solid waste totals 8 million EUR per year. The present article introduces the first stage of the PTP, in Makkah in the pilgrimage season, which consists of five stages: (1) study and treatment of waste streams, (2) slaughterhouse waste treatment, (3) treatment of refuse-derived fuel, (4) treatment of car tires and (5) treatment of slag (the fifth stage associated with each stage from the four previous stages).

  9. Solar Corona Explorer: A mission for the physical diagnosis of the solar corona

    NASA Technical Reports Server (NTRS)

    1981-01-01

    Mission objectives and spacecraft requirements for the Solar Corona Explorer (SCE), a proposed free flying, unmanned solar research craft to be tenatively launched in 1987, were defined. The SCE's purpose is to investigate structure, dynamics and evolution of the corona, globally and in the required physical detail, to study the close coupling between the inner corona and the heliosphere. Investigative objectives are: (1) to understand the corona as the source of varying interplanetary plasma and of varying solar X-ray and extreme ultraviolet fluxes; (2) to develop the capabilities to model the corona with sufficient precision to forecast the Earth's variable environment in space, on the scales from weeks to years; (3) to develop an understanding of the physical processes that determine the dynamics and physical state of the coronal plasma, particularly acceleration processes; and (4) to develop insight and test theory on the Sun applicable to stellar coronae and winds, and in particular, to understand why cool stars put such a large fraction of their energy into X-rays. Considered related factors are: (1) duration of the mission; (2) onboard measuring instrumentation; (3) ground support equipment and procedures; and (4) programs of interpretation and modeling.

  10. RAMI Analysis for Designing and Optimizing Tokamak Cooling Water System (TCWS) for the ITER's Fusion Reactor

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Ferrada, Juan J; Reiersen, Wayne T

    U.S.-ITER is responsible for the design, engineering, and procurement of the Tokamak Cooling Water System (TCWS). TCWS is designed to provide cooling and baking for client systems that include the first wall/blanket, vacuum vessel, divertor, and neutral beam injector. Additional operations that support these primary functions include chemical control of water provided to client systems, draining and drying for maintenance, and leak detection/localization. TCWS interfaces with 27 systems including the secondary cooling system, which rejects this heat to the environment. TCWS transfers heat generated in the Tokamak during nominal pulsed operation - 850 MW at up to 150 C andmore » 4.2 MPa water pressure. Impurities are diffused from in-vessel components and the vacuum vessel by water baking at 200-240 C at up to 4.4 MPa. TCWS is complex because it serves vital functions for four primary clients whose performance is critical to ITER's success and interfaces with more than 20 additional ITER systems. Conceptual design of this one-of-a-kind cooling system has been completed; however, several issues remain that must be resolved before moving to the next stage of the design process. The 2004 baseline design indicated cooling loops that have no fault tolerance for component failures. During plasma operation, each cooling loop relies on a single pump, a single pressurizer, and one heat exchanger. Consequently, failure of any of these would render TCWS inoperable, resulting in plasma shutdown. The application of reliability, availability, maintainability, and inspectability (RAMI) tools during the different stages of TCWS design is crucial for optimization purposes and for maintaining compliance with project requirements. RAMI analysis will indicate appropriate equipment redundancy that provides graceful degradation in the event of an equipment failure. This analysis helps demonstrate that using proven, commercially available equipment is better than using custom-designed equipment with no field experience and lowers specific costs while providing higher reliability. This paper presents a brief description of the TCWS conceptual design and the application of RAMI tools to optimize the design at different stages during the project.« less

  11. Advanced Method of Boundary-Layer Control Based on Localized Plasma Generation

    DTIC Science & Technology

    2009-05-01

    measurements, validation of experiments, wind-tunnel testing of the microwave / plasma generation system , preliminary assessment of energy required...and design of a microwave generator , electrodynamic and multivibrator systems for experiments in the IHM-NAU wind tunnel: MW generator and its high...equipped with the microwave - generation and protection systems to study advanced methods of flow control (Kiev) Fig. 2.1,a. The blade

  12. Preliminary results on complex ceramic layers deposition by atmospheric plasma spraying

    NASA Astrophysics Data System (ADS)

    Florea, Costel; Bejinariu, Costicǎ; Munteanu, Corneliu; Cimpoeşu, Nicanor

    2017-04-01

    In this article we obtain thin layers from complex ceramic powders using industrial equipment based on atmospheric plasma spraying. We analyze the influence of the substrate material roughness on the quality of the thin layers using scanning electron microscopy (SEM) and X-ray dispersive energy analyze (EDAX). Preliminary results present an important dependence between the surface state and the structural and chemical homogeneity.

  13. Plasma cortisol and 11-ketotestosterone enzyme immunoassay (EIA) kit validation for three fish species: the orange clownfish Amphiprion percula, the orangefin anemonefish Amphiprion chrysopterus and the blacktip reef shark Carcharhinus melanopterus.

    PubMed

    Mills, S C; Mourier, J; Galzin, R

    2010-08-01

    Commercially available enzyme immunoassay (EIA) kits were validated for measuring steroid hormone concentrations in blood plasma from three fish species: the orange clownfish Amphiprion percula, the orangefin anemonefish Amphiprion chrysopterus and the blacktip reef shark Carcharhinus melanopterus. A minimum of 5 microl plasma was required to estimate hormone concentrations with both kits. These EIA kits are a simple method requiring minimal equipment, for measuring hormone profiles under field conditions.

  14. Integrated and global pseudotargeted metabolomics strategy applied to screening for quality control markers of Citrus TCMs.

    PubMed

    Shu, Yisong; Liu, Zhenli; Zhao, Siyu; Song, Zhiqian; He, Dan; Wang, Menglei; Zeng, Honglian; Lu, Cheng; Lu, Aiping; Liu, Yuanyan

    2017-08-01

    Traditional Chinese medicine (TCM) exerts its therapeutic effect in a holistic fashion with the synergistic function of multiple characteristic constituents. The holism philosophy of TCM is coincident with global and systematic theories of metabolomics. The proposed pseudotargeted metabolomics methodologies were employed for the establishment of reliable quality control markers for use in the screening strategy of TCMs. Pseudotargeted metabolomics integrates the advantages of both targeted and untargeted methods. In the present study, targeted metabolomics equipped with the gold standard RRLC-QqQ-MS method was employed for in vivo quantitative plasma pharmacochemistry study of characteristic prototypic constituents. Meanwhile, untargeted metabolomics using UHPLC-QE Orbitrap HRMS with better specificity and selectivity was employed for identification of untargeted metabolites in the complex plasma matrix. In all, 32 prototypic metabolites were quantitatively determined, and 66 biotransformed metabolites were convincingly identified after being orally administered with standard extracts of four labeled Citrus TCMs. The global absorption and metabolism process of complex TCMs was depicted in a systematic manner.

  15. Development of 4.5 kW SPT T-160 for Joint Tests with NPP TOPAZ-2

    NASA Astrophysics Data System (ADS)

    Koroteev, Anatoly; Petrosov, Valery A.; Vasin, Anatoly L.; Baranov, Vladimir L.; Rebrov, Serdei G.; Wetch, Joseph R.; Wong, See-Pok

    1994-07-01

    The electric thruster T-160 is related to a low thrust rocket engines group which can be used on spacecrafts for their orbit correction and parameters change. T-160 flight tests are supposed to be conducted together with the TOPAZ-2 Nuclear Power Plant (NPP) as a part of the NEPSTP program. The thruster T-160 is a Hall-type plasma accelerator with the closed electron drift. Plasma is accelerated in crossed magnetic and electric fields in an accelerating channel made of insulating material. Gaseous xenon is used as a propellant for the thruster, electric power supply of 4-4.5 kW is required for its operation. The cathode-neutralizer emission element is made of porous tungsten saturated with barium salts. The thruster T-160 is equipped with a flow control unit ensuring propellant coming to the cathode and gas distributing anode, and a power processing unit and can be delivered with a propellant storage and supply system, thus forming a complete propulsion system set.

  16. Accretion growth of water-ice grains in astrophysically-relevant dusty plasma experiment

    NASA Astrophysics Data System (ADS)

    Chai, Kil-Byoung; Marshall, Ryan; Bellan, Paul

    2016-10-01

    The grain growth process in the Caltech water-ice dusty plasma experiment has been studied using a high-speed camera equipped with a long-distance microscope lens. It is found that (i) the ice grain number density decreases four-fold as the average grain length increases from 20 to 80 um, (ii) the ice grain length has a log-normal distribution rather than a power-law dependence, and (iii) no collisions between ice grains are apparent. The grains have a large negative charge so the agglomeration growth is prevented by their strong mutual repulsion. It is concluded that direct accretion of water molecules is in good agreement with the observed ice grain growth. The volumetric packing factor of the ice grains must be less than 0.25 in order for the grain kinetic energy to be sufficiently small to prevent collisions between ice grains; this conclusion is consistent with ice grain images showing a fractal character.

  17. Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

    PubMed Central

    2018-01-01

    Oxide and nitride thin-films of Ti, Hf, and Si serve numerous applications owing to the diverse range of their material properties. It is therefore imperative to have proper control over these properties during materials processing. Ion-surface interactions during plasma processing techniques can influence the properties of a growing film. In this work, we investigated the effects of controlling ion characteristics (energy, dose) on the properties of the aforementioned materials during plasma-enhanced atomic layer deposition (PEALD) on planar and 3D substrate topographies. We used a 200 mm remote PEALD system equipped with substrate biasing to control the energy and dose of ions by varying the magnitude and duration of the applied bias, respectively, during plasma exposure. Implementing substrate biasing in these forms enhanced PEALD process capability by providing two additional parameters for tuning a wide range of material properties. Below the regimes of ion-induced degradation, enhancing ion energies with substrate biasing during PEALD increased the refractive index and mass density of TiOx and HfOx and enabled control over their crystalline properties. PEALD of these oxides with substrate biasing at 150 °C led to the formation of crystalline material at the low temperature, which would otherwise yield amorphous films for deposition without biasing. Enhanced ion energies drastically reduced the resistivity of conductive TiNx and HfNx films. Furthermore, biasing during PEALD enabled the residual stress of these materials to be altered from tensile to compressive. The properties of SiOx were slightly improved whereas those of SiNx were degraded as a function of substrate biasing. PEALD on 3D trench nanostructures with biasing induced differing film properties at different regions of the 3D substrate. On the basis of the results presented herein, prospects afforded by the implementation of this technique during PEALD, such as enabling new routes for topographically selective deposition on 3D substrates, are discussed. PMID:29554799

  18. In situ CF3 Detection in Low Pressure Inductive Discharges by Fourier Transform Infrared Spectroscopy

    NASA Technical Reports Server (NTRS)

    Kim, J. S.; Cappelli, M. A.; Sharma, S. P.; Arnold, J. O. (Technical Monitor)

    1998-01-01

    The detection of CF(x) (x=1-3) radicals in low pressure discharges using source gases such as CF4 and CHF3 is of importance to the understanding of their chemical structure and relevance in plasma based etching processes. These radicals are known to contribute to the formation of fluorocarbon polymer films, which affect the selectivity and anisotropy of etching. In this study, we present preliminary results of the quantitative measurement of trifluoromethyl radicals, CF3, in low pressure discharges. The discharge studied here is an inductively (transformer) coupled plasma (ICP) source in the GEC reference cell, operating on pure CF4 at pressures ranging from 10 - 100 mTorr, This plasma source generates higher electron number densities at lower operating pressures than obtainable with the parallel-plate capacitively coupled version of the GEC reference cell. Also, this expanded operating regime is more relevant to new generations of industrial plasma reactors being used by the microelectronics industry. Fourier transform infrared (FTIR) spectroscopy is employed to observe the absorption band of CF3 radicals in the electronic ground state X2Al in the region of 1233-1270/cm. The spectrometer is equipped with a high sensitivity HgCdTe (MCT) detector and has a fixed resolution of 0.125/cm. The CF3 concentrations are measured for a range of operating pressures and discharge power levels.

  19. 76 FR 72902 - Materials Processing Equipment Technical Advisory Committee;

    Federal Register 2010, 2011, 2012, 2013, 2014

    2011-11-28

    ... DEPARTMENT OF COMMERCE Bureau of Industry and Security Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting The Materials Processing Equipment Technical... questions that affect the level of export controls applicable to materials processing equipment and related...

  20. Observations of weak ionosphere disturbances on the Kharkov incoherent scatter radar

    NASA Astrophysics Data System (ADS)

    Cherniak, Iurii; Lysenko, Valery; Cherniak, Iurii

    The ionosphere plasma characteristics are responding on variations of solar and magnetic activity, high-power processes in the Earth atmosphere and lithosphere. The research of an ionosphere structure and dynamics is important as for understanding physics of processes and radiophysical problems solution. The method of incoherent scatter (IS) of radiowaves allows determining experimentally as regular variations of electronic concentration Ne and concomitant ionosphere parameters, and their behaviour during natural and antropogeneous origin disturbances. The equipment and measurement technique, developed by authors, are allows obtaining reliable data about an ionosphere behaviour during various origin and intensity perturbations. Oservations results of main parameters IS signal and ionosphere plasma during weak magnetic storm, solar eclipse, ionosphere disturbances caused by start of the high-power rocket are presented. Experimentally obtained on the Kharkov IS radar altitude-temporary dependences of disturbed ionosphere plasma parameters during weak intensity magnetic storm 04-06 April 2006 (Kp = 5, Dst = -100 nTl) were adduced. During a main storm phase the positive perturbation was observed (Ne is increased in 1.3 times), April 5, at maximum Dst - negative perturbation (Ne is decreased in 1.6 times), April 6 - positive perturbation (the second positive storm phase - Ne was increased at 1.33 times). During negative ionosphere storm the height of a F2 layer maximum was increased on 30-40 km, ionic temperature in the day is increased on 150K, electronic temperature is increased on 600K. For date 29.03.2006, when take place partial Sun eclipse (disk shadow factor 73 During launch heavy class rocket "Proton-K" december 25, 2006 from Baikonur cosmodrome (distance up to a view point of 2500 km) the perturbations in close space were observed. By measurements results of ionosphere plasma cross-section two disturbed areas were registered. First was observed through 8 mines, and second - through 60 mines after start of the rocket. The altitude-temporary diagrams of ionosphere plasma cross-section distribution were adduced.

  1. Microwave Plasma Hydrogen Recovery System

    NASA Technical Reports Server (NTRS)

    Atwater, James; Wheeler, Richard, Jr.; Dahl, Roger; Hadley, Neal

    2010-01-01

    A microwave plasma reactor was developed for the recovery of hydrogen contained within waste methane produced by Carbon Dioxide Reduction Assembly (CRA), which reclaims oxygen from CO2. Since half of the H2 reductant used by the CRA is lost as CH4, the ability to reclaim this valuable resource will simplify supply logistics for longterm manned missions. Microwave plasmas provide an extreme thermal environment within a very small and precisely controlled region of space, resulting in very high energy densities at low overall power, and thus can drive high-temperature reactions using equipment that is smaller, lighter, and less power-consuming than traditional fixed-bed and fluidized-bed catalytic reactors. The high energy density provides an economical means to conduct endothermic reactions that become thermodynamically favorable only at very high temperatures. Microwave plasma methods were developed for the effective recovery of H2 using two primary reaction schemes: (1) methane pyrolysis to H2 and solid-phase carbon, and (2) methane oligomerization to H2 and acetylene. While the carbon problem is substantially reduced using plasma methods, it is not completely eliminated. For this reason, advanced methods were developed to promote CH4 oligomerization, which recovers a maximum of 75 percent of the H2 content of methane in a single reactor pass, and virtually eliminates the carbon problem. These methods were embodied in a prototype H2 recovery system capable of sustained high-efficiency operation. NASA can incorporate the innovation into flight hardware systems for deployment in support of future long-duration exploration objectives such as a Space Station retrofit, Lunar outpost, Mars transit, or Mars base. The primary application will be for the recovery of hydrogen lost in the Sabatier process for CO2 reduction to produce water in Exploration Life Support systems. Secondarily, this process may also be used in conjunction with a Sabatier reactor employed to stockpile life-support oxygen as well as propellant and fuel production from Martian atmospheric CO2

  2. Surface modification of closed plastic bags for adherent cell cultivation

    NASA Astrophysics Data System (ADS)

    Lachmann, K.; Dohse, A.; Thomas, M.; Pohl, S.; Meyring, W.; Dittmar, K. E. J.; Lindenmeier, W.; Klages, C.-P.

    2011-07-01

    In modern medicine human mesenchymal stem cells are becoming increasingly important. However, a successful cultivation of this type of cells is only possible under very specific conditions. Of great importance, for instance, are the absence of contaminants such as foreign microbiological organisms, i.e., sterility, and the chemical functionalization of the ground on which the cells are grown. As cultivation of these cells makes high demands, a new procedure for cell cultivation has been developed in which closed plastic bags are used. For adherent cell growth chemical functional groups have to be introduced on the inner surface of the plastic bag. This can be achieved by a new, atmospheric-pressure plasma-based method presented in this paper. The method which was developed jointly by the Fraunhofer IST and the Helmholtz HZI can be implemented in automated equipment as is also shown in this contribution. Plasma process gases used include helium or helium-based gas mixtures (He + N2 + H2) and vapors of suitable film-forming agents or precursors such as APTMS, DACH, and TMOS in helium. The effect of plasma treatment is investigated by FTIR-ATR spectroscopy as well as surface tension determination based on contact angle measurements and XPS. Plasma treatment in nominally pure helium increases the surface tension of the polymer foil due to the presence of oxygen traces in the gas and oxygen diffusing through the gas-permeable foil, respectively, reacting with surface radical centers formed during contact with the discharge. Primary amino groups are obtained on the inner surface by treatment in mixtures with nitrogen and hydrogen albeit their amount is comparably small due to diffusion of oxygen through the gas-permeable bag, interfering with the plasma-amination process. Surface modifications introducing amino groups on the inner surface turned out to be most efficient in the promotion of cell growth.

  3. 75 FR 47546 - Materials Processing Equipment; Technical Advisory Committee; Notice of Partially Closed Meeting

    Federal Register 2010, 2011, 2012, 2013, 2014

    2010-08-06

    ... questions that affect the level of export controls applicable to materials processing equipment and related... DEPARTMENT OF COMMERCE Bureau of Industry and Security Materials Processing Equipment; Technical Advisory Committee; Notice of Partially Closed Meeting The Materials Processing Equipment Technical...

  4. 75 FR 66356 - Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting

    Federal Register 2010, 2011, 2012, 2013, 2014

    2010-10-28

    ... questions that affect the level of export controls applicable to materials processing equipment and related... DEPARTMENT OF COMMERCE Bureau of Industry and Security Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting The Materials Processing Equipment Technical...

  5. 78 FR 13625 - Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-02-28

    ... questions that affect the level of export controls applicable to materials processing equipment and related... DEPARTMENT OF COMMERCE Bureau of Industry and Security Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting The Materials Processing Equipment Technical...

  6. 77 FR 65857 - Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-10-31

    ... questions that affect the level of export controls applicable to materials processing equipment and related... DEPARTMENT OF COMMERCE Bureau of Industry and Security Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting The Materials Processing Equipment Technical...

  7. 76 FR 20949 - Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting

    Federal Register 2010, 2011, 2012, 2013, 2014

    2011-04-14

    ... that affect the level of export controls applicable to materials processing equipment and related... DEPARTMENT OF COMMERCE Bureau of Industry and Security Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting The Materials Processing Equipment Technical...

  8. 77 FR 42483 - Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-07-19

    ... questions that affect the level of export controls applicable to materials processing equipment and related... DEPARTMENT OF COMMERCE Bureau of Industry and Security Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting The Materials Processing Equipment Technical...

  9. 78 FR 24160 - Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-04-24

    ... questions that affect the level of export controls applicable to materials processing equipment and related... DEPARTMENT OF COMMERCE Bureau of Industry and Security Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting The Materials Processing Equipment Technical...

  10. 77 FR 25960 - Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting

    Federal Register 2010, 2011, 2012, 2013, 2014

    2012-05-02

    ... questions that affect the level of export controls applicable to materials processing equipment and related... DEPARTMENT OF COMMERCE Bureau of Industry and Security Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting The Materials Processing Equipment Technical...

  11. 78 FR 42754 - Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-07-17

    ... questions that affect the level of export controls applicable to materials processing equipment and related... DEPARTMENT OF COMMERCE Bureau of Industry and Security Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting The Materials Processing Equipment Technical...

  12. 76 FR 42678 - Materials Processing Equipment; Technical Advisory Committee; Notice of Partially Closed Meeting

    Federal Register 2010, 2011, 2012, 2013, 2014

    2011-07-19

    ... questions that affect the level of export controls applicable to materials processing equipment and related... DEPARTMENT OF COMMERCE Bureau of Industry and Security Materials Processing Equipment; Technical Advisory Committee; Notice of Partially Closed Meeting The Materials Processing Equipment Technical...

  13. 78 FR 63161 - Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-10-23

    ... questions that affect the level of export controls applicable to materials processing equipment and related... DEPARTMENT OF COMMERCE Bureau of Industry and Security Materials Processing Equipment Technical Advisory Committee; Notice of Partially Closed Meeting The Materials Processing Equipment Technical...

  14. Atmosphere, Magnetosphere and Plasmas in Space (AMPS). Spacelab payload definition study. Volume 3, book 2: AMPS equipment to Spacelab ICD

    NASA Technical Reports Server (NTRS)

    1976-01-01

    The interfaces between AMPS Payload No.(TBD) and Spacelab are described. The interfaces specified cover the AMPS physical, electrical, and thermal interfaces that are established to prescribe the standard Spacelab configuration required to perform the mission. If the configuration definition changes due to change of Spacelab equipment model, or serial numbers, then reidentification of the Labcraft payload may be required.

  15. Comparing solar energy alternatives

    NASA Astrophysics Data System (ADS)

    White, J. R.

    1984-03-01

    This paper outlines a computational procedure for comparing the merits of alternative processes to convert solar radiation to heat, electrical power, or chemical energy. The procedure uses the ratio of equipment investment to useful work as an index. Comparisons with conversion counterparts based on conventional fuels are also facilitated by examining this index. The procedure is illustrated by comparisons of (1) photovoltaic converters of differing efficiencies; (2) photovoltaic converters with and without focusing concentrators; (3) photovoltaic conversion plus electrolysis vs photocatalysis for the production of hydrogen; (4) photovoltaic conversion plus plasma arcs vs photocatalysis for nitrogen fixation. Estimates for conventionally-fuelled processes are included for comparison. The reasons why solar-based concepts fare poorly in such comparisons are traced to the low energy density of solar radiation and its low stream time factor resulting from the limited number of daylight hours available and clouds obscuring the sun.

  16. Study of Plasma Motor Generator (PMG) tether system for orbit reboost

    NASA Technical Reports Server (NTRS)

    1987-01-01

    Detailed designs were produced for a 2 kW plasma motor generator tether system based largely on existing hardware and hardware designs. Specifically, the hollow cathode design and electronics are derived from ion propulsion equipment. A prototype tether was constructed and will be tested for deployment, strength, resistance to breakage and abrasion and electrical properties. In addition, laboratory development models of the electronics will be used to operate two plasma motor generator hollow cathode assemblies with this tether to verify electrical performance parameters for the complete system. Results show that a low cost demonstration of a plasma motor generator tether system appears to be feasible by the middle of the 1990s.

  17. Isolation of plasma membranes from the nervous system by countercurrent distribution in aqueous polymer two-phase systems.

    PubMed

    Schindler, Jens; Nothwang, Hans Gerd

    2009-01-01

    The plasma membrane separates the cell-interior from the cell's environment. To maintain homeostatic conditions and to enable transfer of information, the plasma membrane is equipped with a variety of different proteins such as transporters, channels, and receptors. The kind and number of plasma membrane proteins are a characteristic of each cell type. Owing to their location, plasma membrane proteins also represent a plethora of drug targets. Their importance has entailed many studies aiming at their proteomic identification and characterization. Therefore, protocols are required that enable their purification in high purity and quantity. Here, we report a protocol, based on aqueous polymer two-phase systems, which fulfils these demands. Furthermore, the protocol is time-saving and protects protein structure and function.

  18. A semi-micromethod for determination of oxalate in human plasma.

    PubMed

    Porowski, Tadeusz; Gałasiński, Władysław

    2003-01-01

    An enzymatic semi-micromethod for oxalate determination in human plasma was elaborated. The principle of the method depends on the oxalate isolation from deproteinized plasma, following determination by the calorimetric oxalate oxidase-peroxidase-indamine system. This method protects against internal oxalate losses and excludes an interference of contaminations. Results, obtained by this method, were reliable and ideally suited for use as real normal values (less than or equal to 6 microM) of oxalate content in the plasma of healthy individuals. The elaborated method, which can assay plasma oxalate accurately in normal individuals as well as in hyperoxalemic conditions is superior to those previously used. The procedure of semi-micromethod does not require expensive equipments and apparatus: it is simple and easy to perform in every laboratory and takes little time.

  19. Lumen claims of the STERRAD 100NX sterilizer: testing performance limits when processing equipment containing long, narrow lumens.

    PubMed

    Diab-Elschahawi, Magda; Blacky, Alexander; Bachhofner, Nicole; Koller, Walter

    2011-11-01

    According to manufacturers information, the STERRAD 100NX sterilizer-a low temperature H(2)O(2) gas plasma sterilizer-can adequately process single channel stainless steel lumens with an inside diameter of 0.7 mm or larger and a maximum length of 500 mm using standard cycle sterilizing conditions. The aim of this study was to qualify the performance of this H(2)O(2) gas plasma sterilizer under different experimental settings representing worst case conditions. Inoculated carriers were placed at the midpoint position of specified lumens and then submitted to flex scope sterilizing conditions. To simulate insufficient cleaning or crystalline residues, we added organic and inorganic challenges to our inoculated carriers. For experiments done with unchallenged carriers, quantitative analysis reached a log(10) reduction rate of ≥5.71, whereas qualitative results showed no growth in 24 out of 30 biologic indicators tested using flex scope half cycle conditions. Any additional kind of challenge significantly impaired the sterilization outcome. The findings of our current study emphasize the importance of a thorough validated cleaning of medical devices as well as timing for cleaning and decontamination before being exposed to the H(2)O(2) sterilization process and, furthermore, the need for strict adherence to manufacturer's recommendations. Copyright © 2011 Association for Professionals in Infection Control and Epidemiology, Inc. Published by Mosby, Inc. All rights reserved.

  20. High temperature UF6 RF plasma experiments applicable to uranium plasma core reactors

    NASA Technical Reports Server (NTRS)

    Roman, W. C.

    1979-01-01

    An investigation was conducted using a 1.2 MW RF induction heater facility to aid in developing the technology necessary for designing a self critical fissioning uranium plasma core reactor. Pure, high temperature uranium hexafluoride (UF6) was injected into an argon fluid mechanically confined, steady state, RF heated plasma while employing different exhaust systems and diagnostic techniques to simulate and investigate some potential characteristics of uranium plasma core nuclear reactors. The development of techniques and equipment for fluid mechanical confinement of RF heated uranium plasmas with a high density of uranium vapor within the plasma, while simultaneously minimizing deposition of uranium and uranium compounds on the test chamber peripheral wall, endwall surfaces, and primary exhaust ducts, is discussed. The material tests and handling techniques suitable for use with high temperature, high pressure, gaseous UF6 are described and the development of complementary diagnostic instrumentation and measurement techniques to characterize the uranium plasma, effluent exhaust gases, and residue deposited on the test chamber and exhaust system components is reported.

  1. Virtual manufacturing work cell for engineering

    NASA Astrophysics Data System (ADS)

    Watanabe, Hideo; Ohashi, Kazushi; Takahashi, Nobuyuki; Kato, Kiyotaka; Fujita, Satoru

    1997-12-01

    The life cycles of products have been getting shorter. To meet this rapid turnover, manufacturing systems must be frequently changed as well. In engineering to develop manufacturing systems, there are several tasks such as process planning, layout design, programming, and final testing using actual machines. This development of manufacturing systems takes a long time and is expensive. To aid the above engineering process, we have developed the virtual manufacturing workcell (VMW). This paper describes a concept of VMW and design method through computer aided manufacturing engineering using VMW (CAME-VMW) related to the above engineering tasks. The VMW has all design data, and realizes a behavior of equipment and devices using a simulator. The simulator has logical and physical functionality. The one simulates a sequence control and the other simulates motion control, shape movement in 3D space. The simulator can execute the same control software made for actual machines. Therefore we can verify the behavior precisely before the manufacturing workcell will be constructed. The VMW creates engineering work space for several engineers and offers debugging tools such as virtual equipment and virtual controllers. We applied this VMW to development of a transfer workcell for vaporization machine in actual manufacturing system to produce plasma display panel (PDP) workcell and confirmed its effectiveness.

  2. Atmospheric, Magnetospheric, and Plasmas in Space (AMPS) spacelab payload definition study, appendixes

    NASA Technical Reports Server (NTRS)

    Keeley, J. T.

    1976-01-01

    An equipment list, instrument baseline data, engineering drawings, mass properties computer printouts, electrical energy management, and control and display functional analysis pertinent to the AMPS (Satellite Payload) are presented.

  3. 10 CFR 110.8 - List of nuclear facilities and equipment under NRC export licensing authority.

    Code of Federal Regulations, 2013 CFR

    2013-01-01

    ... based enrichment plants, plasma separation enrichment plants, electromagnetic enrichment plants, and... enrichment equipment—Appendix G; and electromagnetic enrichment equipment—Appendix H.) (c) Plants for the...

  4. 10 CFR 110.8 - List of nuclear facilities and equipment under NRC export licensing authority.

    Code of Federal Regulations, 2014 CFR

    2014-01-01

    ... based enrichment plants, plasma separation enrichment plants, electromagnetic enrichment plants, and... enrichment equipment—Appendix G; and electromagnetic enrichment equipment—Appendix H.) (c) Plants for the...

  5. 10 CFR 110.8 - List of nuclear facilities and equipment under NRC export licensing authority.

    Code of Federal Regulations, 2012 CFR

    2012-01-01

    ... based enrichment plants, plasma separation enrichment plants, electromagnetic enrichment plants, and... enrichment equipment—Appendix G; and electromagnetic enrichment equipment—Appendix H.) (c) Plants for the...

  6. 10 CFR 110.8 - List of nuclear facilities and equipment under NRC export licensing authority.

    Code of Federal Regulations, 2011 CFR

    2011-01-01

    ... based enrichment plants, plasma separation enrichment plants, electromagnetic enrichment plants, and... enrichment equipment—Appendix G; and electromagnetic enrichment equipment—Appendix H.) (c) Plants for the...

  7. 10 CFR 110.8 - List of nuclear facilities and equipment under NRC export licensing authority.

    Code of Federal Regulations, 2010 CFR

    2010-01-01

    ... based enrichment plants, plasma separation enrichment plants, electromagnetic enrichment plants, and... enrichment equipment—Appendix G; and electromagnetic enrichment equipment—Appendix H.) (c) Plants for the...

  8. Upgrade of the neutral particle analyzers for the TJ-II stellarator

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Fontdecaba, J. M., E-mail: josepmaria.fontdecaba@ciemat.es; Ros, A.; McCarthy, K. J.

    2014-11-15

    The TJ-II stellarator, a magnetically confined plasma device, is equipped with a broad range of diagnostics for plasma characterization. These include 4 neutral particle analyzers (NPAs), consisting of two Acord-12's, to perform poloidal measurements, plus a compact NPA, and an Acord-24, these in tangential viewing positions. The Acord-12's were originally equipped with two rows of 6 channels each, one for hydrogen neutrals and the other for deuterium neutrals but were changed to a single row of 12 detectors for hydrogen, the principal working gas in TJ-II. With this upgrade the resultant improved energy resolution spectrum has allowed more reliable ionmore » temperature estimates to be obtained. Here we present the upgrades undertaken and present results to demonstrate the improved performance of this diagnostic.« less

  9. Free-world microelectronic manufacturing equipment

    NASA Astrophysics Data System (ADS)

    Kilby, J. S.; Arnold, W. H.; Booth, W. T.; Cunningham, J. A.; Hutcheson, J. D.; Owen, R. W.; Runyan, W. R.; McKenney, Barbara L.; McGrain, Moira; Taub, Renee G.

    1988-12-01

    Equipment is examined and evaluated for the manufacture of microelectronic integrated circuit devices and sources for that equipment within the Free World. Equipment suitable for the following are examined: single-crystal silicon slice manufacturing and processing; required lithographic processes; wafer processing; device packaging; and test of digital integrated circuits. Availability of the equipment is also discussed, now and in the near future. Very adequate equipment for most stages of the integrated circuit manufacturing process is available from several sources, in different countries, although the best and most widely used versions of most manufacturing equipment are made in the United States or Japan. There is also an active market in used equipment, suitable for manufacture of capable integrated circuits with performance somewhat short of the present state of the art.

  10. Education Demonstration Equipment

    NASA Astrophysics Data System (ADS)

    Nagy, A.; Lee, R. L.

    2005-10-01

    Several GA Fusion Education Program plasma related demonstration items were developed this year. A 120 V ac powered electromagnetic coil shows eddy current levitation over an aluminum sheet and continuously changing magnetic force interactions using additional permanent magnets. A 300 V dc plasma device, with variable current capability and analog data ports, is used to develop plasma I/V plots. An on-demand (via push button) fully enclosed 24 in. Jacob's ladder provides air plasma and buoyancy effects. A low cost Mason jar vacuum chamber filled with inert gas shows pressure and gas species plasma characteristics when excited by a Tesla coil. These demonstration items are used in the Scientist-In-the-Classroom program, GA facility tours, and teacher seminars to present plasma to students and teachers. Three very popular Build-It workshops were held to enable teachers to build these items and take them back to their classroom.

  11. Computational Modeling as a Design Tool in Microelectronics Manufacturing

    NASA Technical Reports Server (NTRS)

    Meyyappan, Meyya; Arnold, James O. (Technical Monitor)

    1997-01-01

    Plans to introduce pilot lines or fabs for 300 mm processing are in progress. The IC technology is simultaneously moving towards 0.25/0.18 micron. The convergence of these two trends places unprecedented stringent demands on processes and equipments. More than ever, computational modeling is called upon to play a complementary role in equipment and process design. The pace in hardware/process development needs a matching pace in software development: an aggressive move towards developing "virtual reactors" is desirable and essential to reduce design cycle and costs. This goal has three elements: reactor scale model, feature level model, and database of physical/chemical properties. With these elements coupled, the complete model should function as a design aid in a CAD environment. This talk would aim at the description of various elements. At the reactor level, continuum, DSMC(or particle) and hybrid models will be discussed and compared using examples of plasma and thermal process simulations. In microtopography evolution, approaches such as level set methods compete with conventional geometric models. Regardless of the approach, the reliance on empricism is to be eliminated through coupling to reactor model and computational surface science. This coupling poses challenging issues of orders of magnitude variation in length and time scales. Finally, database development has fallen behind; current situation is rapidly aggravated by the ever newer chemistries emerging to meet process metrics. The virtual reactor would be a useless concept without an accompanying reliable database that consists of: thermal reaction pathways and rate constants, electron-molecule cross sections, thermochemical properties, transport properties, and finally, surface data on the interaction of radicals, atoms and ions with various surfaces. Large scale computational chemistry efforts are critical as experiments alone cannot meet database needs due to the difficulties associated with such controlled experiments and costs.

  12. [A design of software for management of hospital equipment maintenance process].

    PubMed

    Xie, Haiyuan; Liu, Yiqing

    2010-03-01

    According to the circumstance of hospital equipment maintenance, we designed a computer program for management of hospital equipment maintenance process by Java programming language. This program can control the maintenance process, increase the efficiency; and be able to fix the equipment location.

  13. Unprecedented Fine Structure of a Solar Flare Revealed by the 1.6 m New Solar Telescope

    PubMed Central

    Jing, Ju; Xu, Yan; Cao, Wenda; Liu, Chang; Gary, Dale; Wang, Haimin

    2016-01-01

    Solar flares signify the sudden release of magnetic energy and are sources of so called space weather. The fine structures (below 500 km) of flares are rarely observed and are accessible to only a few instruments world-wide. Here we present observation of a solar flare using exceptionally high resolution images from the 1.6 m New Solar Telescope (NST) equipped with high order adaptive optics at Big Bear Solar Observatory (BBSO). The observation reveals the process of the flare in unprecedented detail, including the flare ribbon propagating across the sunspots, coronal rain (made of condensing plasma) streaming down along the post-flare loops, and the chromosphere’s response to the impact of coronal rain, showing fine-scale brightenings at the footpoints of the falling plasma. Taking advantage of the resolving power of the NST, we measure the cross-sectional widths of flare ribbons, post-flare loops and footpoint brighenings, which generally lie in the range of 80–200 km, well below the resolution of most current instruments used for flare studies. Confining the scale of such fine structure provides an essential piece of information in modeling the energy transport mechanism of flares, which is an important issue in solar and plasma physics. PMID:27071459

  14. Assembly & Metrology of First Wall Components of SST-1

    NASA Astrophysics Data System (ADS)

    Parekh, Tejas; Santra, Prosenjit; Biswas, Prabal; Patel, Hiteshkumar; Paravastu, Yuvakiran; Jaiswal, Snehal; Chauhan, Pradeep; Babu, Gattu Ramesh; A, Arun Prakash; Bhavsar, Dhaval; Raval, Dilip C.; Khan, Ziauddin; Pradhan, Subrata

    2017-04-01

    First Wall Components (FWC) of SST-1 tokamak, which are in the immediate vicinity of plasma comprises of limiters, divertors, baffles, passive stabilizers are designed to operate long duration (1000 s) discharges of elongated plasma. All FWC consists of a copper alloy heat sink modules with SS cooling tubes brazed onto it, graphite tiles acting as armour material facing the plasma, and are mounted to the vacuum vessels with suitable Inconel support structures at ring & port locations. The FWC are very recently assembled and commissioned successfully inside the vacuum vessel of SST-1 undergoing a meticulous planning of assembly sequence, quality checks at every stage of the assembly process. This paper will present the metrology aspects & procedure of each FWC, both outside the vacuum vessel, and inside the vessel, assembly tolerances, tools, equipment and jig/fixtures, used at each stage of assembly, starting from location of support bases on vessel rings, fixing of copper modules on support structures, around 3800 graphite tile mounting on 136 copper modules with proper tightening torques, till final toroidal and poloidal geometry of the in-vessel components are obtained within acceptable limits, also ensuring electrical continuity of passive stabilizers to form a closed saddle loop, electrical isolation of passive stabilizers from vacuum vessel.

  15. Method & apparatus for monitoring plasma processing operations

    DOEpatents

    Smith, Jr., Michael Lane; Ward, Pamela Denise; Stevenson, Joel O'Don

    2004-10-19

    The invention generally relates to various aspects of a plasma process and, more specifically, to the monitoring of such plasma processes. One aspect relates to a plasma monitoring module that may be adjusted in at least some manner so as to re-evaluate a previously monitored plasma process. For instance, optical emissions data on a plasma process that was previously monitored by the plasma monitoring module may be replayed through the plasma monitoring module after making at least one adjustment in relation to the plasma monitoring module.

  16. Incense and joss stick making in small household factories, Thailand.

    PubMed

    Siripanich, S; Siriwong, W; Keawrueang, P; Borjan, M; Robson, M

    2014-07-01

    Incense and joss stick are generally used in the world. Most products were made in small household factories. There are many environmental and occupational hazards in these factories. To evaluate the workplace environmental and occupational hazards in small household incense and joss stick factories in Roi-Et, Thailand. Nine small household factories in rural areas of Roi-Et, Thailand, were studied. Dust concentration and small aerosol particles were counted through real time exposure monitoring. The inductively coupled plasma optical emission spectrometry (ICP-OES) was used for quantitative measurement of heavy metal residue in incense products. Several heavy metals were found in dissolved dye and joss sticks. Those included barium, manganese, and lead. Rolling and shaking processes produced the highest concentration of dust and aerosols. Only 3.9% of female workers used personal protection equipment. Dust and chemicals were major threats in small household incense and joss stick factories in Thailand. Increasing awareness towards using personal protection equipment and emphasis on elimination of environmental workplace hazards should be considered to help the workers of this industry.

  17. 49 CFR 1242.46 - Computers and data processing equipment (account XX-27-46).

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... REPORTS SEPARATION OF COMMON OPERATING EXPENSES BETWEEN FREIGHT SERVICE AND PASSENGER SERVICE FOR RAILROADS 1 Operating Expenses-Equipment § 1242.46 Computers and data processing equipment (account XX-27-46... 49 Transportation 9 2012-10-01 2012-10-01 false Computers and data processing equipment (account...

  18. 49 CFR 1242.46 - Computers and data processing equipment (account XX-27-46).

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... REPORTS SEPARATION OF COMMON OPERATING EXPENSES BETWEEN FREIGHT SERVICE AND PASSENGER SERVICE FOR RAILROADS 1 Operating Expenses-Equipment § 1242.46 Computers and data processing equipment (account XX-27-46... 49 Transportation 9 2013-10-01 2013-10-01 false Computers and data processing equipment (account...

  19. 49 CFR 1242.46 - Computers and data processing equipment (account XX-27-46).

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... REPORTS SEPARATION OF COMMON OPERATING EXPENSES BETWEEN FREIGHT SERVICE AND PASSENGER SERVICE FOR RAILROADS 1 Operating Expenses-Equipment § 1242.46 Computers and data processing equipment (account XX-27-46... 49 Transportation 9 2011-10-01 2011-10-01 false Computers and data processing equipment (account...

  20. 49 CFR 1242.46 - Computers and data processing equipment (account XX-27-46).

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... REPORTS SEPARATION OF COMMON OPERATING EXPENSES BETWEEN FREIGHT SERVICE AND PASSENGER SERVICE FOR RAILROADS 1 Operating Expenses-Equipment § 1242.46 Computers and data processing equipment (account XX-27-46... 49 Transportation 9 2014-10-01 2014-10-01 false Computers and data processing equipment (account...

  1. 49 CFR 1242.46 - Computers and data processing equipment (account XX-27-46).

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... REPORTS SEPARATION OF COMMON OPERATING EXPENSES BETWEEN FREIGHT SERVICE AND PASSENGER SERVICE FOR RAILROADS 1 Operating Expenses-Equipment § 1242.46 Computers and data processing equipment (account XX-27-46... 49 Transportation 9 2010-10-01 2010-10-01 false Computers and data processing equipment (account...

  2. Dusty plasmas over the Moon: theory research in support of the upcoming lunar missions

    NASA Astrophysics Data System (ADS)

    Popel, Sergey; Zelenyi, Lev; Zakharov, Alexander; Izvekova, Yulia; Dolnikov, Gennady; Dubinskii, Andrey; Kopnin, Sergey; Golub, Anatoly

    The future Russian lunar missions Luna 25 and Luna 27 are planned to be equipped with instruments for direct detection of nano- and microscale dust particles and determination of plasma properties over the surface of the Moon. Lunar dust over the Moon is usually considered as a part of a dusty plasma system. Here, we present the main our theory results concerning the lunar dusty plasmas. We start with the description of the observational data on dust particles on and over the surface of the Moon. We show that the size distribution of dust on the lunar surface is in a good agreement with the Kolmogorov distribution, which is the size distribution of particles in the case of multiple crushing. We discuss the role of adhesion which has been identified as a significant force in the dust particle launching process. We evaluate the adhesive force for lunar dust particles with taking into account the roughness and adsorbed molecular layers. We show that dust particle launching can be explained if the dust particles rise at a height of about dozens of nanometers owing to some processes. This is enough for the particles to acquire charges sufficient for the dominance of the electrostatic force over the gravitational and adhesive forces. The reasons for the separation of the dust particles from the surface of the Moon are, in particular, their heating by solar radiation and cooling. We consider migration of free protons in regolith from the viewpoint of the photoemission properties of the lunar soil. Finally, we develop a model of dusty plasma system over the Moon and show that it includes charged dust, photoelectrons, and electrons and ions of the solar wind. We determine the distributions of the photoelectrons and find the characteristics of the dust which rise over the lunar regolith. We show that there are no significant constraints on the Moon landing sites for future lunar missions that will study dusty plasmas in the surface layer of the Moon. We discuss also waves in dusty plasmas over the lunar surface. This work was supported by the Presidium of the Russian Academy of Sciences (basic research program no. 22 “Fundamental Problems of Research and Exploration of the Solar System”) and by the Russian Foundation for Basic Research (project 12-02-00270-a).

  3. NETL Research Technology

    ScienceCinema

    None

    2018-01-16

    NETL is committed to providing its researchers with the latest scientific equipment. This video highlights three technologies: the Beowulf Cluster supercomputer, the OASIS Surface Analytical and Imaging System, and the gas chromatograph-inductively coupled plasma-mass spectrometer, or GC-ICP-MS.

  4. The structure and physical-mechanical properties of the heat-resistant Ni-Co-Cr-Al-Y intermetallic coating obtained using rebuilt plasma equipment

    NASA Astrophysics Data System (ADS)

    Tarasenko, Yu. P.; Tsareva, I. N.; Berdnik, O. B.; Fel, Ya. A.; Kuzmin, V. I.; Mikhalchenko, A. A.; Kartaev, E. V.

    2014-12-01

    Results of a study of the structure, physico-mechanical properties, and the resistance to heat of Ni-Co-Cr-Al-Y intermetallic coatings obtained by powder spraying on the standard UPU-3D plasma spray facility (plasmatron with self-establishing arc length) and on the rebuilt facility equipped with the enhanced-power PNK-50 plasmatron with sectionalized inter-electrode insert, are reported. Coatings of higher density ( ρ = 7.9 g/cm3) and higher microhardness (H μ = 770 kg-force/mm2) with lower porosity values ( P = 5.7 %, P c = 5.1 %, and P 0 = 0.6 %) and high resistance to heat ((M - M0)/M0 = 1.2) were obtained. The developed coating is intended for protection of the working surfaces of turbine engine blades in gas-turbine power plants.

  5. FY 2017 Center Innovation Fund Annual Report - Highlights/Abstract section

    NASA Technical Reports Server (NTRS)

    Hintze, Paul; Youngquist, Robert C.; Massa, Gioia D.; Meier, Anne J.

    2017-01-01

    This project evaluated the feasibility of low pressure cold plasma (CP) for two applications: disinfection of produce grown in space and sterilization of medical equipment in space. Currently there is no ISS capability for disinfecting pick and eat crops, food utensils, food production areas, or medical devices. This deficit is extended to projected long duration missions. Small, portable, cold plasma devices would provide an enhanced benefit to crew health and address issues concerning microbial cross contamination. The technology would contribute to the reduction of solid waste since currently crews utilize benzalkonium chloride wet wipes for cleaning surfaces and might use PRO-SAN wipes for cleaning vegetables. CP cleaning/disinfection/sterilization can work on many surfaces, including all metals, most polymers, and this project evaluated produce. Therefore CP provides a simple system that has many different cleaning application in space: produce, medical equipment, cutlery, miscellaneous tools.

  6. Development and validation of LC-MS/MS methods for the determination of mirabegron and its metabolites in human plasma and their application to a clinical pharmacokinetic study.

    PubMed

    Teijlingen, Raymond van; Meijer, John; Takusagawa, Shin; Gelderen, Marcel van; Beld, Cas van den; Usui, Takashi

    2012-03-01

    Mirabegron is being developed for the treatment of overactive bladder. To support the development of mirabegron, including pharmacokinetic studies, liquid chromatography/tandem mass spectrometry methods for mirabegron and eight metabolites (M5, M8, M11-M16) were developed and validated for heparinized human plasma containing sodium fluoride. Four separate bioanalytical methods were developed for the analysis of: (1) mirabegron; (2) M5 and M16; (3) M8; and (4) M11-M15. Either solid-phase extraction or liquid-liquid extraction was used to extract the analytes of interest from matrix constituents. For mirabegron, an Inertsil C₈-3 analytical column was used and detection was performed using a triple-quad mass spectrometer equipped with an atmospheric pressure chemical ionization interface. For the metabolite assays, chromatographic separation was performed through a Phenomenex Synergi Fusion-RP C₁₈ analytical column and detection was performed using a triple-quad mass spectrometer equipped with a Heated Electrospray Ionization interface. The validation results demonstrated that the developed liquid chromatography/tandem mass spectrometry methods were precise, accurate, and selective for the determination of mirabegron and its metabolites in human plasma. All methods were successfully applied in evaluating the pharmacokinetic parameters of mirabegron and metabolites in human plasma. Copyright © 2012 Elsevier B.V. All rights reserved.

  7. DOE Office of Scientific and Technical Information (OSTI.GOV)

    Zwicker, Andrew P.; Bloom, Josh; Albertson, Robert

    3D printing has become popular for a variety of users, from industrial to the home hobbyist, to scientists and engineers interested in producing their own laboratory equipment. In order to determine the suitability of 3D printed parts for our plasma physics laboratory, we measured the accuracy, strength, vacuum compatibility, and electrical properties of pieces printed in plastic. The flexibility of rapidly creating custom parts has led to the 3D printer becoming an invaluable resource in our laboratory and is equally suitable for producing equipment for advanced undergraduate laboratories.

  8. 40 CFR 63.161 - Definitions.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... subpart that references this subpart. Batch process means a process in which the equipment is fed... generally emptied. Examples of industries that use batch processes include pharmaceutical production and pesticide production. Batch product-process equipment train means the collection of equipment (e.g...

  9. 40 CFR 63.161 - Definitions.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... subpart that references this subpart. Batch process means a process in which the equipment is fed... generally emptied. Examples of industries that use batch processes include pharmaceutical production and pesticide production. Batch product-process equipment train means the collection of equipment (e.g...

  10. 40 CFR 63.161 - Definitions.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... subpart that references this subpart. Batch process means a process in which the equipment is fed... generally emptied. Examples of industries that use batch processes include pharmaceutical production and pesticide production. Batch product-process equipment train means the collection of equipment (e.g...

  11. 40 CFR 63.161 - Definitions.

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... subpart that references this subpart. Batch process means a process in which the equipment is fed... generally emptied. Examples of industries that use batch processes include pharmaceutical production and pesticide production. Batch product-process equipment train means the collection of equipment (e.g...

  12. Progress in neutron-, X-ray- and VIS spectroscopic diagnostics of large-scale plasma focus experiments at ICDMP

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Schmidt, Hellmut

    Substantial progress has been made in various diagnostics for investigating results of experiments during the last years performed with the PF1000 device at IPPLM, Warsaw, Poland. In addition to standard diagnostics of the electrical characteristics of up to 1 MJ discharges in a Mather type plasma focus geometry, such as high speed photography, X-ray, fast electron beam and time-integrated neutron measurements, there have been made among others at least three quite successful efforts recently: 1) Setting up of a neutron time-of-flight line with up to five scintillation detectors including optical fibre based data collection equipment, 2) Use of a Mechellemore » spectrometer with CCD registration and possibility to take time-resolved spectra with resolutions down to 100 ns and 3) Setting up and using pinhole cameras equipped with solid state nuclear track detectors for the detection of fusion generated protons. Correlations of emission events as well as plasma and electrical current dynamics are investigated. Neutron emission characteristics and fusion products production mechanisms are discussed considering a generalized beam target model, called Gyrating Particle Model.« less

  13. Measurement of the deuterium Balmer series line emission on EAST

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Wu, C. R.; Xu, Z.; Jin, Z.

    Volume recombination plays an important role towards plasma detachment for magnetically confined fusion devices. High quantum number states of the Balmer series of deuterium are used to study recombination. On EAST (Experimental Advanced Superconducting Tokamak), two visible spectroscopic measurements are applied for the upper/lower divertor with 13 channels, respectively. Both systems are coupled with Princeton Instruments ProEM EMCCD 1024B camera: one is equipped on an Acton SP2750 spectrometer, which has a high spectral resolution ∼0.0049 nm with 2400 gr/mm grating to measure the D{sub α}(H{sub α}) spectral line and with 1200 gr/mm grating to measure deuterium molecular Fulcher band emissionsmore » and another is equipped on IsoPlane SCT320 using 600 gr/mm to measure high-n Balmer series emission lines, allowing us to study volume recombination on EAST and to obtain the related line averaged plasma parameters (T{sub e}, n{sub e}) during EAST detached phases. This paper will present the details of the measurements and the characteristics of deuterium Balmer series line emissions during density ramp-up L-mode USN plasma on EAST.« less

  14. FOREWORD: 23rd National Symposium on Plasma Science & Technology (PLASMA-2008)

    NASA Astrophysics Data System (ADS)

    Das, A. K.

    2010-01-01

    The Twentieth Century has been a defining period for Plasma Science and Technology. The state of ionized matter, so named by Irving Langmuir in the early part of twentieth century, has now evolved in to a multidisciplinary area with scientists and engineers from various specializations working together to exploit the unique properties of the plasma medium. There have been great improvements in the basic understanding of plasmas as a many body system bound by complex collective Coulomb interactions of charges, atoms, molecules, free radicals and photons. Simultaneously, many advanced plasma based technologies are increasingly being implemented for industrial and societal use. The emergence of the multination collaborative project International Thermonuclear Experimental Reactor (ITER) project has provided the much needed boost to the researchers working on thermonuclear fusion plasmas. In addition, the other plasma applications like MHD converters, hydrogen generation, advanced materials (synthesis, processing and surface modification), environment (waste beneficiation, air and water pollution management), nanotechnology (synthesis, deposition and etching), light production, heating etc are actively being pursued in governmental and industrial sectors. For India, plasma science and technology has traditionally remained an important area of research. It was nearly a century earlier that the Saha ionization relation pioneered the way to interpret experimental data from a vast range of near equilibrium plasmas. Today, Indian research contributions and technology demonstration capabilities encompass thermonuclear fusion devices, nonlinear plasma phenomena, plasma accelerators, beam plasma interactions, dusty and nonneutral plasmas, industrial plasmas and plasma processing of materials, nano synthesis and structuring, astrophysical and space plasmas etc. India's participation in the ITER programme is now reflected in increased interest in the research and development efforts on Tokamak technology and physics of magnetized fusion plasmas. Our industries have already adopted a large number of plasma processes related to manufacturing, lighting and surface engineering. Indian universities and National Institutes have successfully taken up research projects and building of demonstration equipment that are being used in strategic as well as other industrial applications. In addition, and more importantly, plasma science has triggered research and development effort in many related areas like power supplies, specialized instrumentation and controls, magnets, diagnostics and monitoring, lasers, electron beams, vacuum systems, thermal engineering, material science, fluid dynamics, molecular and nano engineering, molecular chemistry etc. In short, plasma science and technology in India has reached a stage of maturity that can be harnessed for industrial and societal use. The expertise and core competence developed over the years need to be sustained through interactions among researchers as well as nurturing of new research efforts. The Annual Plasma Symposiums have eminently worked towards achievement of that purpose. Like all years, Plasma - 2008 is built around the entire national effort in this field with a special focus on 'Plasmas in Nuclear Fuel Cycle (PANFC)'. The program includes several plenary lectures, invited talks and contributed papers. The manuscripts have been peer reviewed and compiled in the form of Conference Proceedings. I am sure that the online proceedings will be useful and serve as a valuable reference material for active researchers in this field. I would like to take this opportunity to gratefully acknowledge the help and guidance of the National Advisory Committee Chaired by Professor P K Kaw, Director, Institute of Plasma Research, Gandhinagar during the organization of this symposium. My sincere thanks to Dr S Banerjee, Director, Bhabha Atomic Research Center, an acknowledged expert in the field of Materials Science and Technology, for delivering the key note address to set the tenor of the symposium. I would also like to thank the Plasma Science Society of India (PSSI) for agreeing to hold this important event at BARC. Thanks are due to Dr L M Gantayet, Director, BTDG, BARC and chairman, Scientific Program Committee and all my colleagues in the Symposium Organizing Committee who have made this symposium possible. Finally, our thanks to all the Funding agencies, Board of Research in Nuclear Science, Department of Science and Technology, The Board of Fusion Research, and all industrial exhibitor and sponsors for their unstinted support and encouragement. Dr A K Das Chairman, Organizing Committee Bhabha Atomic Research Center, Mumbai

  15. Invention of the Annular Inductively Coupled Plasma as a Spectroscopic Source

    NASA Astrophysics Data System (ADS)

    Greenfield, Stanley

    2000-05-01

    This paper shows how experiments with electrical discharges from the 18th century onward led to their use as sources in atomic spectroscopy and how the invention of the annular inductively coupled plasma (ICP) some 30 years ago arose from the need to solve a problem that necessitated the use of a high-temperature source. The search for such a source followed a fairly logical pattern involving dc plasma jets and an ICP such as had been used by T. B. Reed for crystal growing. The ellipsoidal plasma used by Reed was not entirely suitable as a spectroscopic source, since the analytical sample either mixed with the plasma gases or passed around the plasma, resulting in matrix effects and a diminution in the emission. It is shown how suitable modification of the plasma torch with attention to gas flows made it possible to produce an annular or tunnel plasma through which the sample aerosol could be passed, resulting in an annular ICP with greatly improved spectroscopic properties. The further refinements to the source and ancillary equipment are also discussed.

  16. Spark plasma sintering of bulk SrAl2O4-Sr3Al2O6 eutectic glass with wide-band optical window.

    PubMed

    Liu, Jiaxi; Lu, Nan; He, Gang; Li, Xiaoyu; Li, Jianqiang; Li, Jiangtao

    2018-06-15

    SrAl 2 O 4 -Sr 3 Al 2 O 6 eutectic glass was prepared by using an aerodynamic levitator equipped with a CO 2 laser device. A bulk transparent amorphous sample was obtained by the spark plasma sintering (SPS) of the prepared eutectic glass. XRD, a UV-vis-NIR spectrophotometer and FT-IR were employed to characterize the phase evolution and optical properties. The results show that the bulk SrAl 2 O 4 -Sr 3 Al 2 O 6 samples fabricated by the containerless process and SPS between 852 °C-857 °C were fully amorphous. The amorphous sample has a wide transparent window between 270 nm and 6.2 μm. The average refractive index in the visible light region is 1.680 and the Abbe number is 27.4. The prepared bulk SrAl 2 O 4 -Sr 3 Al 2 O 6 eutectic glass with the wide-band optical window may be a promising candidate for optical applications.

  17. Comparison of femtosecond and nanosecond laser ablation inductively coupled plasma mass spectrometry for uranium isotopic measurements

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Havrilla, George Joseph; McIntosh, Kathryn Gallagher; Judge, Elizabeth

    2016-10-20

    Feasibility tests were conducted using femtosecond and nanosecond laser ablation inductively coupled plasma mass spectrometry for rapid uranium isotopic measurements. The samples used in this study consisted of a range of pg quantities of known 235/238 U solutions as dried spot residues of 300 pL drops on silicon substrates. The samples spanned the following enrichments of 235U: 0.5, 1.5, 2, 3, and 15.1%. In this direct comparison using these particular samples both pulse durations demonstrated near equivalent data can be produced on either system with respect to accuracy and precision. There is no question that either LA-ICP-MS method offers themore » potential for rapid, accurate and precise isotopic measurements of U10Mo materials whether DU, LEU or HEU. The LA-ICP-MS equipment used for this work is commercially available. The program is in the process of validating this work for large samples using center samples strips from Y-12 MP-1 LEU-Mo Casting #1.« less

  18. Spark plasma sintering of bulk SrAl2O4-Sr3Al2O6 eutectic glass with wide-band optical window

    NASA Astrophysics Data System (ADS)

    Liu, Jiaxi; Lu, Nan; He, Gang; Li, Xiaoyu; Li, Jianqiang; Li, Jiangtao

    2018-06-01

    SrAl2O4-Sr3Al2O6 eutectic glass was prepared by using an aerodynamic levitator equipped with a CO2 laser device. A bulk transparent amorphous sample was obtained by the spark plasma sintering (SPS) of the prepared eutectic glass. XRD, a UV–vis-NIR spectrophotometer and FT-IR were employed to characterize the phase evolution and optical properties. The results show that the bulk SrAl2O4-Sr3Al2O6 samples fabricated by the containerless process and SPS between 852 °C–857 °C were fully amorphous. The amorphous sample has a wide transparent window between 270 nm and 6.2 μm. The average refractive index in the visible light region is 1.680 and the Abbe number is 27.4. The prepared bulk SrAl2O4-Sr3Al2O6 eutectic glass with the wide-band optical window may be a promising candidate for optical applications.

  19. Efficiency improvement of technological preparation of power equipment manufacturing

    NASA Astrophysics Data System (ADS)

    Milukov, I. A.; Rogalev, A. N.; Sokolov, V. P.; Shevchenko, I. V.

    2017-11-01

    Competitiveness of power equipment primarily depends on speeding-up the development and mastering of new equipment samples and technologies, enhancement of organisation and management of design, manufacturing and operation. Actual political, technological and economic conditions cause the acute need in changing the strategy and tactics of process planning. At that the issues of maintenance of equipment with simultaneous improvement of its efficiency and compatibility to domestically produced components are considering. In order to solve these problems, using the systems of computer-aided process planning for process design at all stages of power equipment life cycle is economically viable. Computer-aided process planning is developed for the purpose of improvement of process planning by using mathematical methods and optimisation of design and management processes on the basis of CALS technologies, which allows for simultaneous process design, process planning organisation and management based on mathematical and physical modelling of interrelated design objects and production system. An integration of computer-aided systems providing the interaction of informative and material processes at all stages of product life cycle is proposed as effective solution to the challenges in new equipment design and process planning.

  20. Predicting the magnetospheric plasma of weather

    NASA Technical Reports Server (NTRS)

    Dawson, John M.

    1986-01-01

    The prediction of the plasma environment in time, the plasma weather, is discussed. It is important to be able to predict when large magnetic storms will produce auroras, which will affect the space station operating in low orbit, and what precautions to take both for personnel and sensitive control (computer) equipment onboard. It is also important to start to establish a set of plasma weather records and a record of the ability to predict this weather. A successful forecasting system requires a set of satellite weather stations to provide data from which predictions can be made and a set of plasma weather codes capable of accurately forecasting the status of the Earth's magnetosphere. A numerical magnetohydrodynamic fluid model which is used to model the flow in the magnetosphere, the currents flowing into and out of the auroral regions, the magnetopause, the bow shock location and the magnetotail of the Earth is discussed.

  1. Influence of the electron cyclotron resonance plasma confinement on reducing the bremsstrahlung production of an electron cyclotron resonance ion source with metal-dielectric structures.

    PubMed

    Schachter, L; Stiebing, K E; Dobrescu, S

    2009-01-01

    The influence of metal-dielectric (MD) layers (MD structures) inserted into the plasma chamber of an electron cyclotron resonance ion source (ECRIS) onto the production of electron bremsstrahlung radiation has been studied in a series of dedicated experiments at the 14 GHz ECRIS of the Institut für Kernphysik der Universität Frankfurt. The IKF-ECRIS was equipped with a MD liner, covering the inner walls of the plasma chamber, and a MD electrode, covering the plasma-facing side of the extraction electrode. On the basis of similar extracted currents of highly charged ions, significantly reduced yields of bremsstrahlung radiation for the "MD source" as compared to the standard (stainless steel) source have been measured and can be explained by the significantly better plasma confinement in a MD source as compared to an "all stainless steel" ECRIS.

  2. Plasma brake model for preliminary mission analysis

    NASA Astrophysics Data System (ADS)

    Orsini, Leonardo; Niccolai, Lorenzo; Mengali, Giovanni; Quarta, Alessandro A.

    2018-03-01

    Plasma brake is an innovative propellantless propulsion system concept that exploits the Coulomb collisions between a charged tether and the ions in the surrounding environment (typically, the ionosphere) to generate an electrostatic force orthogonal to the tether direction. Previous studies on the plasma brake effect have emphasized the existence of a number of different parameters necessary to obtain an accurate description of the propulsive acceleration from a physical viewpoint. The aim of this work is to discuss an analytical model capable of estimating, with the accuracy required by a preliminary mission analysis, the performance of a spacecraft equipped with a plasma brake in a (near-circular) low Earth orbit. The simplified mathematical model is first validated through numerical simulations, and is then used to evaluate the plasma brake performance in some typical mission scenarios, in order to quantify the influence of the system parameters on the mission performance index.

  3. Flexible microfluidic devices with three-dimensional interconnected microporous walls for gas and liquid applications.

    PubMed

    Yuen, Po Ki; DeRosa, Michael E

    2011-10-07

    This article presents a simple, low-cost method of fabrication and the applications of flexible polystyrene microfluidic devices with three-dimensional (3D) interconnected microporous walls based on treatment using a solvent/non-solvent mixture at room temperature. The complete fabrication process from device design concept to working device can be completed in less than an hour in a regular laboratory setting, without the need for expensive equipment. Microfluidic devices were used to demonstrate gas generation and absorption reactions by acidifying water with carbon dioxide (CO(2)) gas. By selectively treating the microporous structures with oxygen plasma, acidification of water by acetic acid (distilled white vinegar) perfusion was also demonstrated with the same device design.

  4. Fast neutron flux analyzer with real-time digital pulse shape discrimination

    NASA Astrophysics Data System (ADS)

    Ivanova, A. A.; Zubarev, P. V.; Ivanenko, S. V.; Khilchenko, A. D.; Kotelnikov, A. I.; Polosatkin, S. V.; Puryga, E. A.; Shvyrev, V. G.; Sulyaev, Yu. S.

    2016-08-01

    Investigation of subthermonuclear plasma confinement and heating in magnetic fusion devices such as GOL-3 and GDT at the Budker Institute (Novosibirsk, Russia) requires sophisticated equipment for neutron-, gamma- diagnostics and upgrading data acquisition systems with online data processing. Measurement of fast neutron flux with stilbene scintillation detectors raised the problem of discrimination of the neutrons (n) from background cosmic particles (muons) and neutron-induced gamma rays (γ). This paper describes a fast neutron flux analyzer with real-time digital pulse-shape discrimination (DPSD) algorithm FPGA-implemented for the GOL-3 and GDT devices. This analyzer was tested and calibrated with the help of 137Cs and 252Cf radiation sources. The Figures of Merit (FOM) calculated for different energy cuts are presented.

  5. Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies.

    PubMed

    Faraz, Tahsin; Knoops, Harm C M; Verheijen, Marcel A; van Helvoirt, Cristian A A; Karwal, Saurabh; Sharma, Akhil; Beladiya, Vivek; Szeghalmi, Adriana; Hausmann, Dennis M; Henri, Jon; Creatore, Mariadriana; Kessels, Wilhelmus M M

    2018-04-18

    Oxide and nitride thin-films of Ti, Hf, and Si serve numerous applications owing to the diverse range of their material properties. It is therefore imperative to have proper control over these properties during materials processing. Ion-surface interactions during plasma processing techniques can influence the properties of a growing film. In this work, we investigated the effects of controlling ion characteristics (energy, dose) on the properties of the aforementioned materials during plasma-enhanced atomic layer deposition (PEALD) on planar and 3D substrate topographies. We used a 200 mm remote PEALD system equipped with substrate biasing to control the energy and dose of ions by varying the magnitude and duration of the applied bias, respectively, during plasma exposure. Implementing substrate biasing in these forms enhanced PEALD process capability by providing two additional parameters for tuning a wide range of material properties. Below the regimes of ion-induced degradation, enhancing ion energies with substrate biasing during PEALD increased the refractive index and mass density of TiO x and HfO x and enabled control over their crystalline properties. PEALD of these oxides with substrate biasing at 150 °C led to the formation of crystalline material at the low temperature, which would otherwise yield amorphous films for deposition without biasing. Enhanced ion energies drastically reduced the resistivity of conductive TiN x and HfN x films. Furthermore, biasing during PEALD enabled the residual stress of these materials to be altered from tensile to compressive. The properties of SiO x were slightly improved whereas those of SiN x were degraded as a function of substrate biasing. PEALD on 3D trench nanostructures with biasing induced differing film properties at different regions of the 3D substrate. On the basis of the results presented herein, prospects afforded by the implementation of this technique during PEALD, such as enabling new routes for topographically selective deposition on 3D substrates, are discussed.

  6. Analysis of flight equipment purchasing practices of representative air carriers

    NASA Technical Reports Server (NTRS)

    1977-01-01

    The process through which representative air carriers decide whether or not to purchase flight equipment was investigated as well as their practices and policies in retiring surplus aircraft. An analysis of the flight equipment investment decision process in ten airlines shows that for the airline industry as a whole, the flight equipment investment decision is in a state of transition from a wholly informal process in earliest years to a much more organized and structured process in the future. Individual air carriers are in different stages with respect to the formality and sophistication associated with the flight equipment investment decision.

  7. AC Josephson effect applications in microwave systems

    NASA Astrophysics Data System (ADS)

    Larkin, Serguey Y.

    1996-12-01

    A complication of the tasks solving by the modem radliolocation, radionavigation and communication systems connected with the demand promotion to the resolution and accuracy of coordinates definition and increase in the volumes of transmitted information in satellite communication systems has resulted in boisterous mastering of millimeter wave bands. Success in microwave technology reached in 80' allowed such leading instrument developing companies as Hewlett Packard; EIP, lB millimeter etc. to set up an output of mm- and submm-wave bands devices and systems. It has streamlined Scientific Technological Progress in several spheres, since millimeter, through infra-red frequency range was closed to researchers for a long period of time because of the absence of necessary equipment. At present microwave devices of the short-wave part of mm- wave band and of submm- wave bands are used not only in radiolocation and communications. Unique diagnostic systems based on the analysis of the radiation parameters of different microwave sources were created. They have their application in medicine, thermonuclear energetics, radioastronomy, biology, nuclear physics, the physics of the solid state body, geology, etc. The above circumstances caused the beginning of the measuring microwave technology researches in 60 to 600 GHz frequency range: generators, power and frequency meters, spectrum analyzers. The task of working out equipment and techniques of the effective control as well as frequency and intensity measurements of the microwave signals in the investigated range is of the special interest. Here are some examples. The creation of a thermonuclear reactor in ITER project is considered to be the project of the century in the energetics sphere. One of the basic engineering tasks in the course of project realization is the creation of the diagnostic equipment realizing in real time spectrum analysis of thermonuclear plasma radiation at the so called cyclotron hannonics. Such analysis allow to get the picture of temperature distribution along the plasma cord diameter in accordance with dynamics of thermonuclear process development. Modem raclioastronomic research gives scientists the unique information on the world tructure. It is also necessary to analyze Space microwave radiation providing exclusive sensitivity of the equipment. In both cases equipment is required to be superwide band, to have high sensitivity and ability to operate at more than 300 GHz frequencies. Today all these requirements are met by the devices using the ac Josephson effect. The Josephson junctions are used as an active transforming element in such devices. At the end of 20 century the sphere of their utilization embraces medicine, communications, radiophysics, space exploration, ecology, military use, etc. The State Research Center "Fonon" ( SRC "Fonon") of the State Committee on Science and Technology of Ukraine was founded in 1991. The main aim of its creation was to concentrate the scientific and financial efforts for development and production of unique devices based on the results of fundamental study in physics of high T superconductivity. First of all we were interested in technological research on the obtaining of low impedance Josephson junctions out of the High T thin films. Using such junctions in combination with our original techniques developed in our Center we have succeed in creating the following new generation equipment: industrial set-up of the frequency meter in the range of 60 ... 600 GHz; experimental set-up of the spectrum analyzer operating in the range of 50 250 GHz; experimental model of radiometric receiver in 180...260 GHz range. All the above devices are based on the using ac Josephson effect for the receiving and processing mm- and submm- microwave signals.

  8. Plasma Processing of Metallic and Semiconductor Thin Films in the Fisk Plasma Source

    NASA Technical Reports Server (NTRS)

    Lampkin, Gregory; Thomas, Edward, Jr.; Watson, Michael; Wallace, Kent; Chen, Henry; Burger, Arnold

    1998-01-01

    The use of plasmas to process materials has become widespread throughout the semiconductor industry. Plasmas are used to modify the morphology and chemistry of surfaces. We report on initial plasma processing experiments using the Fisk Plasma Source. Metallic and semiconductor thin films deposited on a silicon substrate have been exposed to argon plasmas. Results of microscopy and chemical analyses of processed materials are presented.

  9. 40 CFR 63.342 - Standards.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... to the requirements of this subpart, including associated air pollution control equipment and monitoring equipment, in a manner consistent with safety and good air pollution control practices for..., infrequent, and unavoidable failure of air pollution control equipment, process equipment, or a process to...

  10. 40 CFR 63.342 - Standards.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... to the requirements of this subpart, including associated air pollution control equipment and monitoring equipment, in a manner consistent with safety and good air pollution control practices for..., infrequent, and unavoidable failure of air pollution control equipment, process equipment, or a process to...

  11. Propagation of atmospheric pressure helium plasma jet into ambient air at laminar gas flow

    NASA Astrophysics Data System (ADS)

    Pinchuk, M.; Stepanova, O.; Kurakina, N.; Spodobin, V.

    2017-05-01

    The formation of an atmospheric pressure plasma jet (APPJ) in a gas flow passing through the discharge gap depends on both gas-dynamic properties and electrophysical parameters of the plasma jet generator. The paper presents the results of experimental and numerical study of the propagation of the APPJ in a laminar flow of helium. A dielectric-barrier discharge (DBD) generated inside a quartz tube equipped with a coaxial electrode system, which provided gas passing through it, served as a plasma source. The transition of the laminar regime of gas flow into turbulent one was controlled by the photography of a formed plasma jet. The corresponding gas outlet velocity and Reynolds numbers were revealed experimentally and were used to simulate gas dynamics with OpenFOAM software. The data of the numerical simulation suggest that the length of plasma jet at the unvarying electrophysical parameters of DBD strongly depends on the mole fraction of ambient air in a helium flow, which is established along the direction of gas flow.

  12. Microwave produced plasma in a Toroidal Device

    NASA Astrophysics Data System (ADS)

    Singh, A. K.; Edwards, W. F.; Held, E. D.

    2010-11-01

    A currentless toroidal plasma device exhibits a large range of interesting basic plasma physics phenomena. Such a device is not in equilibrium in a strict magneto hydrodynamic sense. There are many sources of free energy in the form of gradients in plasma density, temperature, the background magnetic field and the curvature of the magnetic field. These free energy sources excite waves and instabilities which have been the focus of studies in several devices in last two decades. A full understanding of these simple plasmas is far from complete. At Utah State University we have recently designed and installed a microwave plasma generation system on a small tokamak borrowed from the University of Saskatchewan, Saskatoon, Canada. Microwaves are generated at 2.45 GHz in a pulsed dc mode using a magnetron from a commercial kitchen microwave oven. The device is equipped with horizontal and vertical magnetic fields and a transformer to impose a toroidal electric field for current drive. Plasmas can be obtained over a wide range of pressure with and without magnetic fields. We present some preliminary measurements of plasma density and potential profiles. Measurements of plasma temperature at different operating conditions are also presented.

  13. Plasma Synthesis and Sintering of Advanced Ceramics

    DTIC Science & Technology

    1990-09-15

    CONTENTS Page LIST OF TABLES iv OBJECTIVES 1 COLLOIDAL PLASMA PROCESSING: CONCEPTS 1 BACKGROUND 2 Ultrafine Particles 2 Colloidal Plasma 3 Particle...colloidal plasma processing of ceramics. COLLOIDAL PLASMA PROCESSING: CONCEPTS It is well known that ultrafine particles prepared in gas plasmas agglomerate...BACKGROUND Ultrafine Particles . There are well recognized advantages to using small particles in ceramic processing. The instantaneous densification

  14. 21 CFR 640.34 - Processing.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Plasma § 640.34 Processing. (a) Plasma. Plasma shall be... collecting, processing, and storage system unless the product is to be stored as Liquid Plasma. (b) Fresh Frozen Plasma. Fresh frozen plasma shall be prepared from blood collected by a single uninterrupted...

  15. 21 CFR 640.34 - Processing.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Plasma § 640.34 Processing. (a) Plasma. Plasma shall be... collecting, processing, and storage system unless the product is to be stored as Liquid Plasma. (b) Fresh Frozen Plasma. Fresh frozen plasma shall be prepared from blood collected by a single uninterrupted...

  16. 21 CFR 640.34 - Processing.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Plasma § 640.34 Processing. (a) Plasma. Plasma shall be... collecting, processing, and storage system unless the product is to be stored as Liquid Plasma. (b) Fresh Frozen Plasma. Fresh frozen plasma shall be prepared from blood collected by a single uninterrupted...

  17. 21 CFR 640.34 - Processing.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Plasma § 640.34 Processing. (a) Plasma. Plasma shall be... collecting, processing, and storage system unless the product is to be stored as Liquid Plasma. (b) Fresh Frozen Plasma. Fresh frozen plasma shall be prepared from blood collected by a single uninterrupted...

  18. 21 CFR 640.34 - Processing.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Plasma § 640.34 Processing. (a) Plasma. Plasma shall be... collecting, processing, and storage system unless the product is to be stored as Liquid Plasma. (b) Fresh Frozen Plasma. Fresh frozen plasma shall be prepared from blood collected by a single uninterrupted...

  19. The synergetic effect of UV rays on the decomposition of xylene in dielectric barrier discharge plasma and photocatalyst process

    NASA Astrophysics Data System (ADS)

    Li, Wenjuan; Gu, Zhenyu; Teng, Fuhua; Lu, Jianhai; Dong, Shibi; Miao, Xiaoping; Wu, Zhongbiao

    2018-06-01

    The degradation of xylene in the dielectric barrier discharge plasma and photocatalyst process was studied, focusing on the synergetic effect of UV rays from plasma process and external UV lamps on the decomposition of xylene. The results showed that xylene could be decomposed by the discharge process in plasma system, whereas the UV rays from plasma process was very weak. After adding TiO2, the removal efficiency of xylene and energy yield in plasma process were enhanced since energetic particles activated the catalysis of TiO2. The removal efficiency of xylene and energy field in plasma and photocatalyst process combined with external UV lamps were further enhanced attributed to the degradation effect of plasma, the catalysis of TiO2 activated by plasma, the photolysis of UV rays and the photocatalysis of photocatalyst. The synergetic effect of UV rays from external UV lamps was obvious.

  20. The role of engineering in the flight equipment purchasing process

    NASA Technical Reports Server (NTRS)

    1977-01-01

    The role of the airline engineering department in the flight equipment acquisition process is examined. The data for the study was collected from six airlines. The principal findings of the study include: (1) engineering activities permeate, but do not dominate the airline flight equipment decision process. (2) The principal criterion for the flight equipment acquisition decision is return on investment. (3) The principal sources of information for the airline engineering departments in the monitoring process are the manufacturers of equipment. Subsidiary information sources include NASA publications and conferences, among others and (4) The engineering department is the principal communication channel for technical information.

  1. University Researchers Approach to Providing Computer Simulations to Industry.

    NASA Astrophysics Data System (ADS)

    Birdsall, Charles

    1996-05-01

    University researchers perform in an exploratory mode in developing and applying computer simulations to their research problems. Post-docs and students make codes suited to their problems, and to thesis and article writing, with little code use planned beyond such. Industry product developers want well tested, cleanly applicable simulation codes, with freedom to go to the code developers for bug fixing and improvements (and not to have to hunt for a student who has graduated). Hence, these different modes clash; some cushion of understanding and new elements are needed to effect broader, continuing use of university developed codes. We and others have evolved approaches that appear to work, including providing free software, but with follow-ups done by small companies. (See Ref. 1 for more.) We will present our development of plasma device codes over 15 years, evolving into free distribution on the Internet (Ref. 2) with short courses and workshops; follow-ups are done by a small company (of former students, the code writers). In addition, an example of university code development will be given, that of application of the series (or dipole) resonance to providing plasma surface wave generated plasmas, drawing on decades old research; potential applications will be given. We will present what other university groups are doing and reflections on these modes by modelers and designers in the plasma processing industry (semiconductor manufacturing equipment companies), which is highly empirical at present. All of this interaction is still evolving. 9 Brown J. Browning, Sci.Am. Jan 1996, p.35 www See Internet address http://ptsg.eecs.berkeley.edu thebibliography

  2. Spectral study of interaction between chondroitin sulfate and nanoparticles and its application in quantitative analysis

    NASA Astrophysics Data System (ADS)

    Ma, Yi; Wei, Maojie; Zhang, Xiao; Zhao, Ting; Liu, Xiumei; Zhou, Guanglian

    2016-01-01

    In this work, the interaction between chondroitin sulfate (CS) and gold nanoparticles (GNPs) and silver nanoparticles (SNPs) was characterized for the first time. Plasma resonance scattering (PRS) and plasma resonance absorption (PRA) were used to investigate the characteristics of their spectrum. The results suggested that the CS with negative charge could interact with metal nanoparticles with negative charge and the adsorption of CS on the surface of SNPs was more regular than that of GNPs. The resonance scattering spectra also further confirmed the interaction between CS and SNPs. A new method for detection of CS based on the interaction was developed. CS concentrations in the range of 0.02-3.5 μg/mL were proportional to the decreases of absorbance of SNPs. Compared with other reported methods, the proposed method is simple and workable without complex process, high consumption and expensive equipments. The developed method was applied to the determination of the CS contents from different biological origins and the results were compared with those obtained by the method of Chinese Pharmacopeia. The effects of matrix in plasma and other glycosaminoglycans on the determination of CS were also investigated. The results showed that a small quantity of blood plasma had no effect on the determination of CS and when the concentration ratio of CS to heparin was more than 10:1, the influence of heparin on the detection of CS could be ignored. This work gave a specific research direction for the detection of CS in the presence of metal nanoparticles.

  3. Charging and Heating Dynamics of Nanoparticles in Nonthermal Plasmas

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Kortshagen, Uwe R.

    2014-08-15

    The focus of this award was to understand the interactions of nanometer-sized particles with ionized gases, also called plasmas. Plasmas are widely used in the fabrication of electronic circuits such as microprocessors and memory devices, in plasma display panels, as well as in medical applications. Recently, these ionized gases are finding applications in the synthesis of advanced nanomaterials with novel properties, which are based on nanometer-sized particulate (nanoparticles) building blocks. As these nanoparticles grow in the plasma environment, they interact with the plasmas species such as electrons and ions which critically determines the nanoparticle properties. The University of Minnesota researchersmore » conducting this project performed numerical simulations and developed analytical models that described the interaction of plasma-bound nanoparticles with the plasma ions. The plasma ions bombard the nanoparticle surface with substantial energy, which can result in the rearrangement of the nanoparticles’ atoms, giving them often desirable structures at the atomic scale. Being able to tune the ion energies allows to control the properties of nanoparticles produced in order to tailor their attributes for certain applications. For instance, when used in high efficiency light emitting devices, nanoparticles produced under high fluxes of highly energetic ions may show superior light emission to particles produced under low fluxes of less energetic ions. The analytical models developed by the University of Minnesota researchers enable the research community to easily determine the energy of ions bombarding the nanoparticles. The researchers extensively tested the validity of the analytical models by comparing them to sophisticated computer simulations based on stochastic particle modeling, also called Monte Carlo modeling, which simulated the motion of hundreds of thousands of ions and their interaction with the nanoparticle surfaces. Beyond the scientific intellectual merits, this award had significant broader impacts. Two graduate students received their doctoral degrees and both have joined a U.S. manufacturer of plasma-based semiconductor processing equipment. Four undergraduate students participated in research conducted under this grant and gained valuable hands-on laboratory experience. A middle school science teacher observed research conducted under this grant and developed three new course modules that introduce middle school students to the concepts of nanometer scale, the atomic structure of matter, and the composition of matter of different chemical elements.« less

  4. Determination of Cd, Cr, Hg and Pb in plastics from waste electrical and electronic equipment by inductively coupled plasma mass spectrometry with collision-reaction interface technology.

    PubMed

    Santos, Mirian C; Nóbrega, Joaquim A; Cadore, Solange

    2011-06-15

    A procedure based on the use of a quadrupole inductively coupled plasma-mass spectrometer equipped with a collision-reaction interface (CRI) for control of spectral overlap interferences was developed for simultaneous determination of Cd, Cr, Hg, and Pb in plastics from waste electrical and electronic equipment (WEEE). The injection of H(2) and He (80 and 60 mL min(-1), respectively) into the sampled plasma, colliding and reacting with potentially interfering polyatomic ions, allows interference-free determination of chromium via its isotopes (52)Cr and (53)Cr that are freed from overlap due to the occurrence of (40)Ar(12)C(+), (40)Ar(12)C(1)H(+), (36)S(16)O(+) or (1)H(36)S(16)O(+). Cadmium, Hg and Pb were directly determined via their isotopes (110)Cd, (111)Cd, (112)Cd, (199)Hg, (200)Hg, (201)Hg, (202)Hg, (206)Pb, (207)Pb, and (208)Pb, without using CRI. The CRI can be quickly activated or deactivated before each analyte measurement. Limits of detection for (52)Cr were 0.04 or 0.14 μg L(-1) with He or H(2) injected in CRI. Cadmium and Pb have LODs between 0.02 and 0.08 μg L(-1) and Hg had 0.93-0.98 μg L(-1), without using CRI. Analyte concentrations for samples varied from 16 to 43, 1 to 11, 4 to 12, and 5 to 13 mg kg(-1) for Cr, Cd, Hg and Pb, respectively. Copyright © 2011 Elsevier B.V. All rights reserved.

  5. Optical Emission Studies of the NRL Plasma Torch for the Shipboard Waste Treatment Program

    DTIC Science & Technology

    1999-02-26

    Arc Heating of Molten Steel in a Tundish", Plasma Chemistry and Plasma Processing, Vol.14, pp.361-381,1994. [3] H. Herman, "Plasma-sprayed...Treatment", Plasma Chemistry and Plasma Processing, Vol.15, pp.677-692,1995. [5] S. Paik and H.D. Nguyen, "Numerical Modeling of Multiphase Plasma/Soil Row...Gleizes, S. Vacquie and P. Brunelot, "Modeling of the Cathode Jet of a High- Power Transferred Arc", Plasma Chemistry and Plasma Processing, Vol.13

  6. Confinement in Wendelstein 7-X Limiter Plasmas

    DOE PAGES

    Hirsch, M.; Dinklage, A.; Alonso, A.; ...

    2017-06-14

    Observations on confinement in the first experimental campaign on the optimized Stellarator Wendelstein 7-X are summarized. In this phase W7-X was equipped with five inboard limiters only and thus the discharge length restricted to avoid local overheating. Stationary plasmas are limited to low densities <2–3 centerdot 10 19 m -3. With the available 4.3 MW ECR Heating core T e ~ 8 keV, T i ~ 1–2 keV are achieved routinely resulting in energy confinement time τ E between 80 ms to 150 ms. For these conditions the plasmas show characteristics of core electron root confinement with peaked T e-profilesmore » and positive E r up to about half of the minor radius. Lastly, profiles and plasma currents respond to on- and off-axis heating and co- and counter ECCD respectively.« less

  7. Atomic Precision Plasma Processing - Modeling Investigations

    NASA Astrophysics Data System (ADS)

    Rauf, Shahid

    2016-09-01

    Sub-nanometer precision is increasingly being required of many critical plasma processes in the semiconductor industry. Some of these critical processes include atomic layer etch and plasma enhanced atomic layer deposition. Accurate control over ion energy and ion / radical composition is needed during plasma processing to meet the demanding atomic-precision requirements. While improvements in mainstream inductively and capacitively coupled plasmas can help achieve some of these goals, newer plasma technologies can expand the breadth of problems addressable by plasma processing. Computational modeling is used to examine issues relevant to atomic precision plasma processing in this paper. First, a molecular dynamics model is used to investigate atomic layer etch of Si and SiO2 in Cl2 and fluorocarbon plasmas. Both planar surfaces and nanoscale structures are considered. It is shown that accurate control of ion energy in the sub-50 eV range is necessary for atomic scale precision. In particular, if the ion energy is greater than 10 eV during plasma processing, several atomic layers get damaged near the surface. Low electron temperature (Te) plasmas are particularly attractive for atomic precision plasma processing due to their low plasma potential. One of the most attractive options in this regard is energetic-electron beam generated plasma, where Te <0.5 eV has been achieved in plasmas of molecular gases. These low Te plasmas are computationally examined in this paper using a hybrid fluid-kinetic model. It is shown that such plasmas not only allow for sub-5 eV ion energies, but also enable wider range of ion / radical composition. Coauthors: Jun-Chieh Wang, Jason Kenney, Ankur Agarwal, Leonid Dorf, and Ken Collins.

  8. Tri-Service Construction Guide Specifications

    DTIC Science & Technology

    1992-04-01

    Equipment 11474 NN 9102 11757 Radiographic Darkroom Equipment 11476 VA 8202 11471 Revolving Darkroom Doors 11494 VA 8201 11491 Hydrotherapy Equipment...11494 NN 9102 11716 Hydrotherapy Equipment 11500 CE 9105 11500 Air Pollution Control 11500 NS 9103 13255 Cleaning for Process Piping Systems 11600 NN...Doors (11471) 4 11494 - Hydrotherapy Equipment (11491) 0 0 11500 - Air Pollution Control 0 11500 - Cleaning for Process Piping Systems (13255) 0 11600

  9. Plasma Hazards and Acceptance for International Space Station Extravehicular Activities

    NASA Astrophysics Data System (ADS)

    Patton, Thomas

    2010-09-01

    Extravehicular activity(EVA) is accepted by NASA and other space faring agencies as a necessary risk in order to build and maintain a safe and efficient laboratory in space. EVAs are used for standard construction and as contingency operations to repair critical equipment for vehicle sustainability and safety of the entire crew in the habitable volume. There are many hazards that are assessed for even the most mundane EVA for astronauts, and the vast majority of these are adequately controlled per the rules of the International Space Station Program. The need for EVA repair and construction has driven acceptance of a possible catastrophic hazard to the EVA crewmember which cannot currently be controlled adequately. That hazard is electrical shock from the very environment in which they work. This paper describes the environment, causes and contributors to the shock of EVA crewmembers attributed to the ionospheric plasma environment in low Earth orbit. It will detail the hazard history, and acceptance process for the risk associated with these hazards that give assurance to a safe EVA. In addition to the hazard acceptance process this paper will explore other factors that go into the decision to accept a risk including criticality of task, hardware design and capability, and the probability of hazard occurrence. Also included will be the required interaction between organizations at NASA(EVA Office, Environments, Engineering, Mission Operations, Safety) in order to build and eventually gain adequate acceptance rationale for a hazard of this kind. During the course of the discussion, all current methods of mitigating the hazard will be identified. This paper will capture the history of the plasma hazard analysis and processes used by the International Space Station Program to formally assess and qualify the risk. The paper will discuss steps that have been taken to identify and perform required analysis of the floating potential shock hazard from the ISS environment which eventually led to its status as an accepted risk for ISS EVAs.

  10. ITER's Tokamak Cooling Water System and the the Use of ASME Codes to Comply with French Regulations of Nuclear Pressure Equipment

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Berry, Jan; Ferrada, Juan J; Curd, Warren

    During inductive plasma operation of ITER, fusion power will reach 500 MW with an energy multiplication factor of 10. The heat will be transferred by the Tokamak Cooling Water System (TCWS) to the environment using the secondary cooling system. Plasma operations are inherently safe even under the most severe postulated accident condition a large, in-vessel break that results in a loss-of-coolant accident. A functioning cooling water system is not required to ensure safe shutdown. Even though ITER is inherently safe, TCWS equipment (e.g., heat exchangers, piping, pressurizers) are classified as safety important components. This is because the water is predictedmore » to contain low-levels of radionuclides (e.g., activated corrosion products, tritium) with activity levels high enough to require the design of components to be in accordance with French regulations for nuclear pressure equipment, i.e., the French Order dated 12 December 2005 (ESPN). ESPN has extended the practical application of the methodology established by the Pressure Equipment Directive (97/23/EC) to nuclear pressure equipment, under French Decree 99-1046 dated 13 December 1999, and Order dated 21 December 1999 (ESP). ASME codes and supplementary analyses (e.g., Failure Modes and Effects Analysis) will be used to demonstrate that the TCWS equipment meets these essential safety requirements. TCWS is being designed to provide not only cooling, with a capacity of approximately 1 GW energy removal, but also elevated temperature baking of first-wall/blanket, vacuum vessel, and divertor. Additional TCWS functions include chemical control of water, draining and drying for maintenance, and facilitation of leak detection/localization. The TCWS interfaces with the majority of ITER systems, including the secondary cooling system. U.S. ITER is responsible for design, engineering, and procurement of the TCWS with industry support from an Engineering Services Organization (ESO) (AREVA Federal Services, with support from Northrop Grumman, and OneCIS). ITER International Organization (ITER-IO) is responsible for design oversight and equipment installation in Cadarache, France. TCWS equipment will be fabricated using ASME design codes with quality assurance and oversight by an Agreed Notified Body (approved by the French regulator) that will ensure regulatory compliance. This paper describes the TCWS design and how U.S. ITER and fabricators will use ASME codes to comply with EU Directives and French Orders and Decrees.« less

  11. Application of laser processing for disassembly of nuclear power plants

    NASA Astrophysics Data System (ADS)

    Baranov, Gennady A.; Zinchenko, A. V.; Arutyunyan, R. B.

    1998-12-01

    Provision of safety and drop of ecological risk at salvaging of nuclear submarines (NSM) of Russia Navy Forces represents one of the most actual problems of nowadays. It is necessary to remove from services of Russian Navy Forces 170 - 180 nuclear submarines by 2000. At salvaging of Russian Navy Forces NSM it should be necessary to cut out reactor compartments with more than 150 thousand tons of gross weight and to fragment terminal carcasses of submarines with gross weight of 2 million tons. Taking into account overall dimensions of salvaging objects and Euro-standard requirement on the sizes of carcass fragments, for salvaging of one NSM it is necessary to execute more than 10 km of cuts. Using of conventional methods of gas and plasma cutting of ship constructions and equipment polluted with radioactive oxides and bedding of insulation and paint and varnish materials causes contamination of working zones and environment by a mix of radioactive substances and highly toxic combustion products, nomenclature of which includes up to 50 names. Calculations carried out in the Institute of industrial and Marine Medicine have shown that salvage of just one NSM with using of gas and plasma cutting are accompanied by discharge into an environment of up to 11.5 kg of chromium oxides, up to 22.5 kg of manganese oxides, up to 97 kg of carbon oxides and up to 650 kg of nitrogen oxides. Fragmentation of such equipment by a method of directional explosion or hydraulic jet is problematic because of complexity of treated constructions and necessity to create special protective facilities, which will accumulate a bulk of radioactive and toxic discharges, as a consequence of the explosion and spreaded by shock waves and water deluges. In a number of new technological processes the cutting with using of high-power industrial lasers radiation stands out. As compared with other technological processes, laser cutting has many advantages determined by such unique properties of laser radiation as large power, capability to concentrate power on the small area (up to 108 W/cm2), good spatial and temporal controllability. The laser cutting advantages are the following: (1) high efficiency; (2) capability to cut various materials (metals, alloys, plastics, rubber, ceramics) and their compositions (fiber glass plastics, rubber-plastics, cermets) by one installation; (3) minimum pollution in gas and condensed phases; (4) high degree of technological process automation; (5) remote character of cutting and personnel absence in a processing zone.

  12. Atmospheric Pressure Plasma Jet for Chem/Bio Warfare Decontamination

    NASA Astrophysics Data System (ADS)

    Herrmann, Hans W.; Henins, Ivars; Park, Jaeyoung; Selwyn, Gary S.

    1999-11-01

    Atmospheric Pressure Plasma Jet (APPJ) technology may provide a much needed method of CBW decontamination which, unlike traditional decon methods, is dry and nondestructive to sensitive equipment and materials. The APPJ discharge uses a high-flow feedgas consisting primarily of an inert carrier gas, such as He, and a small amount of a reactive additive, such as O2, which flows between capacitively-coupled electrodes powered at 13.56 MHz. The plasma generates highly reactive metastable and atomic species of oxygen which are then directed onto a contaminated surface. The reactive effluent of the APPJ has been shown to effectively neutralize VX nerve agent as well as simulants for anthrax and mustard blister agent. Research efforts are now being directed towards reducing He consumption and increasing the allowable stand-off distance. Recent results demonstrate that by replacing the O2 reactive additive with CO2, ozone formation is greatly reduced. This has the result of extending the lifetime of atomic oxygen by an order of magnitude or more. A recirculating APP Decon Chamber which combines heat, vacuum, forced convection and reactivity is currently being developed for enhanced decontamination of sensitive equipment. Several techniques are also being evaluated for use in an APP Decon Jet for decontamination of items which cannot be placed inside a chamber.

  13. European Science Notes. Volume 39, Number 4.

    DTIC Science & Technology

    1985-04-01

    segrega- papers seemed to me unusually signifi- tion, may significantly improve plasma- cant. W. Esser ( Kraftwerk Union, AG, sprayed zirconia TBC coatings...forged and heat- -.- ,.- equipment and methods both by MPA and treated vessel of the same alloy. At industry ( Kraftwerk Union AG [KWU]). present, the

  14. GMP in blood collection and processing.

    PubMed

    Wagstaff, W

    1998-01-01

    The principles of Good Manufacturing Practice have, in the main, been universally developed for the guidance of the pharmaceutical industry rather than for transfusion services. However, these rules and guides are increasingly being adapted for use in blood centres, in the production of labile blood components and of plasma for fractionation. The guide for pharmaceutical industries produced by the commission of the European Communities is used as a model here, the nine basic requirements being those applicable to Quality Management, personnel, premises and equipment, document, production, Quality Control, contract manufacture and analysis, complaints and product recall, and self-inspection. Though having more direct application to the production laboratory preparing blood components, the majority of these requirements and principles are also directly applicable to all of the activities involved in blood collection.

  15. Scientist in the Classroom: Highlights of a Plasma Outreach Program

    NASA Astrophysics Data System (ADS)

    Nagy, A.; Lee, R. L.

    2000-10-01

    The General Atomics education program ``Scientist in the Classroom'' now in its third year, uses scientists and engineers to present ``Plasma the fourth state of matter,'' to students in the classroom. A program goal is to make science an enjoyable experience while showing students how plasma plays an important role in their world. A fusion overview is presented, including topics on energy and environment. Using hands-on equipment, students manipulate a plasma discharge using magnets, observe its spectral properties and observe the plasma in a fluorescent tube. In addition, they observe physical properties of liquid nitrogen, and use an infrared camera to observe radiant heat energy. Several program benefits are; it costs less than facility tours, is more flexible in scheduling, and is adaptable for grades 2--adult. The program has doubled in coverage since last year, with over 2200 students at 20 schools visited by 8 scientists. Increased participation by the DIII-D staff in this program has been achieved by enlisting them to bring the program to their children's school.

  16. Building an infrastructure at PICKSC for the educational use of kinetic software tools

    NASA Astrophysics Data System (ADS)

    Mori, W. B.; Decyk, V. K.; Tableman, A.; Fonseca, R. A.; Tsung, F. S.; Hu, Q.; Winjum, B. J.; Amorim, L. D.; An, W.; Dalichaouch, T. N.; Davidson, A.; Joglekar, A.; Li, F.; May, J.; Touati, M.; Xu, X. L.; Yu, P.

    2016-10-01

    One aim of the Particle-In-Cell and Kinetic Simulation Center (PICKSC) at UCLA is to coordinate a community development of educational software for undergraduate and graduate courses in plasma physics and computer science. The rich array of physical behaviors exhibited by plasmas can be difficult to grasp by students. If they are given the ability to quickly and easily explore plasma physics through kinetic simulations, and to make illustrative visualizations of plasma waves, particle motion in electromagnetic fields, instabilities, or other phenomena, then they can be equipped with first-hand experiences that inform and contextualize conventional texts and lectures. We are developing an infrastructure for any interested persons to take our kinetic codes, run them without any prerequisite knowledge, and explore desired scenarios. Furthermore, we are actively interested in any ideas or input from other plasma physicists. This poster aims to illustrate what we have developed and gather a community of interested users and developers. Supported by NSF under Grant ACI-1339893.

  17. Infusing Plasma into the High School Curriculum through Teacher Professional Development

    NASA Astrophysics Data System (ADS)

    Merali, Aliya; Guilbert, Nicholas; Ortiz, Myrna; Zwicker, Andrew

    2013-10-01

    A 2004 report submitted by the Fusion Energy Sciences Advisory Committee noted a critical need for action to prevent a shortage of fusion researchers, specifically highlighting the need for more students to enter the field. In an effort to expose students to plasma physics early on, PPPL created a professional development program for teachers, which provides the resources for infusing plasma into high school curricula. Over the last 15 years, teachers from across the country have participated in a one-week Plasma Camp course including lectures, labs, tours, curriculum planning, and classroom equipment funding opportunities. A 2005 survey indicated that at least 75% of program alumni used material from the workshop annually, primarily in the form of demonstrations. In a 2013 survey, participants were asked to detail how they use the workshop information in their classrooms, how the program has altered their teaching methods, and what factors, if any, have hindered the implementation of a plasma curriculum. Results of the 2013 survey will be presented.

  18. TOPICAL REVIEW: Black silicon method X: a review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as a roadmap to next generation equipment

    NASA Astrophysics Data System (ADS)

    Jansen, H V; de Boer, M J; Unnikrishnan, S; Louwerse, M C; Elwenspoek, M C

    2009-03-01

    An intensive study has been performed to understand and tune deep reactive ion etch (DRIE) processes for optimum results with respect to the silicon etch rate, etch profile and mask etch selectivity (in order of priority) using state-of-the-art dual power source DRIE equipment. The research compares pulsed-mode DRIE processes (e.g. Bosch technique) and mixed-mode DRIE processes (e.g. cryostat technique). In both techniques, an inhibitor is added to fluorine-based plasma to achieve directional etching, which is formed out of an oxide-forming (O2) or a fluorocarbon (FC) gas (C4F8 or CHF3). The inhibitor can be introduced together with the etch gas, which is named a mixed-mode DRIE process, or the inhibitor can be added in a time-multiplexed manner, which will be termed a pulsed-mode DRIE process. Next, the most convenient mode of operation found in this study is highlighted including some remarks to ensure proper etching (i.e. step synchronization in pulsed-mode operation and heat control of the wafer). First of all, for the fabrication of directional profiles, pulsed-mode DRIE is far easier to handle, is more robust with respect to the pattern layout and has the potential of achieving much higher mask etch selectivity, whereas in a mixed-mode the etch rate is higher and sidewall scalloping is prohibited. It is found that both pulsed-mode CHF3 and C4F8 are perfectly suited to perform high speed directional etching, although they have the drawback of leaving the FC residue at the sidewalls of etched structures. They show an identical result when the flow of CHF3 is roughly 30 times the flow of C4F8, and the amount of gas needed for a comparable result decreases rapidly while lowering the temperature from room down to cryogenic (and increasing the etch rate). Moreover, lowering the temperature lowers the mask erosion rate substantially (and so the mask selectivity improves). The pulsed-mode O2 is FC-free but shows only tolerable anisotropic results at -120 °C. The downside of needing liquid nitrogen to perform cryogenic etching can be improved by using a new approach in which both the pulsed and mixed modes are combined into the so-called puffed mode. Alternatively, the use of tetra-ethyl-ortho-silicate (TEOS) as a silicon oxide precursor is proposed to enable sufficient inhibiting strength and improved profile control up to room temperature. Pulsed-mode processing, the second important aspect, is commonly performed in a cycle using two separate steps: etch and deposition. Sometimes, a three-step cycle is adopted using a separate step to clean the bottom of etching features. This study highlights an issue, known by the authors but not discussed before in the literature: the need for proper synchronization between gas and bias pulses to explore the benefit of three steps. The transport of gas from the mass flow controller towards the wafer takes time, whereas the application of bias to the wafer is relatively instantaneous. This delay causes a problem with respect to synchronization when decreasing the step time towards a value close to the gas residence time. It is proposed to upgrade the software with a delay time module for the bias pulses to be in pace with the gas pulses. If properly designed, the delay module makes it possible to switch on the bias exactly during the arrival of the gas for the bottom removal step and so it will minimize the ionic impact because now etch and deposition steps can be performed virtually without bias. This will increase the mask etch selectivity and lower the heat impact significantly. Moreover, the extra bottom removal step can be performed at (also synchronized!) low pressure and therefore opens a window for improved aspect ratios. The temperature control of the wafer, a third aspect of this study, at a higher etch rate and longer etch time, needs critical attention, because it drastically limits the DRIE performance. It is stressed that the exothermic reaction (high silicon loading) and ionic impact (due to metallic masks and/or exposed silicon) are the main sources of heat that might raise the wafer temperature uncontrollably, and they show the weakness of the helium backside technique using mechanical clamping. Electrostatic clamping, an alternative technique, should minimize this problem because it is less susceptible to heat transfer when its thermal resistance and the gap of the helium backside cavity are minimized; however, it is not a subject of the current study. Because oxygen-growth-based etch processes (due to their ultra thin inhibiting layer) rely more heavily on a constant wafer temperature than fluorocarbon-based processes, oxygen etches are more affected by temperature fluctuations and drifts during the etching. The fourth outcome of this review is a phenomenological model, which explains and predicts many features with respect to loading, flow and pressure behaviour in DRIE equipment including a diffusion zone. The model is a reshape of the flow model constructed by Mogab, who studied the loading effect in plasma etching. Despite the downside of needing a cryostat, it is shown that—when selecting proper conditions—a cryogenic two-step pulsed mode can be used as a successful technique to achieve high speed and selective plasma etching with an etch rate around 25 µm min-1 (<1% silicon load) with nearly vertical walls and resist etch selectivity beyond 1000. With the model in hand, it can be predicted that the etch rate can be doubled (50 µm min-1 at an efficiency of 33% for the fluorine generation from the SF6 feed gas) by minimizing the time the free radicals need to pass the diffusion zone. It is anticipated that this residence time can be reduced sufficiently by a proper inductive coupled plasma (ICP) source design (e.g. plasma shower head and concentrator). In order to preserve the correct profile at such high etch rates, the pressure during the bottom removal step should be minimized and, therefore, the synchronized three-step pulsed mode is believed to be essential to reach such high etch rates with sufficient profile control. In order to improve the etch rate even further, the ICP power should be enhanced; the upgrading of the turbopump seems not yet to be relevant because the throttle valve in the current study had to be used to restrict the turbo efficiency. In order to have a versatile list of state-of-the-art references, it has been decided to arrange it in subjects. The categories concerning plasma physics and applications are, for example, books, reviews, general topics, fluorine-based plasmas, plasma mixtures with oxygen at room temperature, wafer heat transfer and high aspect ratio trench (HART) etching. For readers 'new' to this field, it is advisable to study at least one (but rather more than one) of the reviews concerning plasma as found in the first 30 references. In many cases, a paper can be classified into more than one category. In such cases, the paper is directed to the subject most suited for the discussion of the current review. For example, many papers on heat transfer also treat cryogenic conditions and all the references dealing with highly anisotropic behaviour have been directed to the category HARTs. Additional pointers could get around this problem but have the disadvantage of creating a kind of written spaghetti. I hope that the adapted organization structure will help to have a quick look at and understanding of current developments in high aspect ratio plasma etching. Enjoy reading... Henri Jansen 18 June 2008

  19. 40 CFR 63.11395 - What are the standards and compliance requirements for existing sources?

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... routine and long-term maintenance) and continuous monitoring system. (4) A list of operating parameters... polymerization process equipment and monomer recovery process equipment and convey the collected gas stream.... (2) 0.05 lb/hr of AN from the control device for monomer recovery process equipment. (3) If you do...

  20. 40 CFR 63.11395 - What are the standards and compliance requirements for existing sources?

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... routine and long-term maintenance) and continuous monitoring system. (4) A list of operating parameters... polymerization process equipment and monomer recovery process equipment and convey the collected gas stream.... (2) 0.05 lb/hr of AN from the control device for monomer recovery process equipment. (3) If you do...

  1. 40 CFR 63.11395 - What are the standards and compliance requirements for existing sources?

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... routine and long-term maintenance) and continuous monitoring system. (4) A list of operating parameters... polymerization process equipment and monomer recovery process equipment and convey the collected gas stream.... (2) 0.05 lb/hr of AN from the control device for monomer recovery process equipment. (3) If you do...

  2. An improved probit method for assessment of domino effect to chemical process equipment caused by overpressure.

    PubMed

    Mingguang, Zhang; Juncheng, Jiang

    2008-10-30

    Overpressure is one important cause of domino effect in accidents of chemical process equipments. Damage probability and relative threshold value are two necessary parameters in QRA of this phenomenon. Some simple models had been proposed based on scarce data or oversimplified assumption. Hence, more data about damage to chemical process equipments were gathered and analyzed, a quantitative relationship between damage probability and damage degrees of equipment was built, and reliable probit models were developed associated to specific category of chemical process equipments. Finally, the improvements of present models were evidenced through comparison with other models in literatures, taking into account such parameters: consistency between models and data, depth of quantitativeness in QRA.

  3. Improvements to the Processing and Characterization of Needled Composite Laminates

    DTIC Science & Technology

    2014-01-01

    the automated processing equipment are shown and discussed. The modifications allow better spatial control at the penetration sites and the ability... automated processing equipment are shown and discussed. The modifications allow better spatial control at the penetration sites and the ability to...semi- automated processing equipment, commercial off-the-shelf (COTS) needles and COTS aramid mat designed for other applications. Needled material

  4. Description of the plasma diagnostics package (PDP) for the OSS-1 Shuttle mission and JSC plasma chamber test in conjunction with the fast pulse electron gun (FPEG)

    NASA Technical Reports Server (NTRS)

    Shawhan, S. D.

    1982-01-01

    The objectives, equipment, and techniques for the plasma diagnostics package (PDP) carried by the OSS-1 instrument payload of the STS-4 and scheduled for the Spacelab-2 mission are described. The goals of the first flight were to examine the Orbiter-magnetoplasma interactions by measuring the electric and magnetic field strengths, the ionized particle wakes, and the generated waves. The RMS was employed to lift the unit out of the bay in order to allow characterization of the fields, EM interference, and plasma contamination within 15 m of the Orbiter. The PDP will also be used to examine plasma depletion, chemical reaction rates, waves, and energized plasma produced by firing of the Orbiter thrusters. Operation of the PDP was carried out in the NASA Space Environment Simulation Laboratory test chamber, where the PDP was used to assay the fields, fluxes, wave amplitudes, and particle energy spectra. The PDP instrumentation is also capable of detecting thermal ions, thermal electrons suprathermal particles, VHF/UHF EMI levels, and the S-band field strength.

  5. Influence of oxygen in atmospheric-pressure argon plasma jet on sterilization of Bacillus atrophaeous spores

    NASA Astrophysics Data System (ADS)

    Lim, Jin-Pyo; Uhm, Han S.; Li, Shou-Zhe

    2007-09-01

    A nonequilibrium Ar /O2 plasma discharge at atmospheric pressure was carried out in a coaxial cylindrical reactor with a stepped electrode configuration powered by a 13.56MHz rf power supplier. The argon glow discharge with high electron density produces oxygen reactive species in large quantities. Argon plasma jets penetrate deep into ambient air and create a path for oxygen radicals to sterilize microbes. A sterilization experiment with bacterial endospores indicates that an argon-oxygen plasma jet very effectively kills endospores of Bacillus atrophaeus (ATCC 9372), thereby demonstrating its capability to clean surfaces and its usefulness for reinstating contaminated equipment as free from toxic biological warfare agents. The decimal reduction time (D values) of the Ar /O2 plasma jet at an exposure distance of 0.5-1.5cm ranges from 5 to 57s. An actinometric comparison of the sterilization data shows that atomic oxygen radicals play a significant role in plasma sterilization. When observed under a scanning electron microscope, the average size of the spores appears to be greatly reduced due to chemical reactions with the oxygen radicals.

  6. Pesticide-sampling equipment, sample-collection and processing procedures, and water-quality data at Chicod Creek, North Carolina, 1992

    USGS Publications Warehouse

    Manning, T.K.; Smith, K.E.; Wood, C.D.; Williams, J.B.

    1994-01-01

    Water-quality samples were collected from Chicod Creek in the Coastal Plain Province of North Carolina during the summer of 1992 as part of the U.S. Geological Survey's National Water-Quality Assessment Program. Chicod Creek is in the Albemarle-Pamlico drainage area, one of four study units designated to test equipment and procedures for collecting and processing samples for the solid-phase extraction of selected pesticides, The equipment and procedures were used to isolate 47 pesticides, including organonitrogen, carbamate, organochlorine, organophosphate, and other compounds, targeted to be analyzed by gas chromatography/mass spectrometry. Sample-collection and processing equipment equipment cleaning and set-up procedures, methods pertaining to collecting, splitting, and solid-phase extraction of samples, and water-quality data resulting from the field test are presented in this report Most problems encountered during this intensive sampling exercise were operational difficulties relating to equipment used to process samples.

  7. Surface properties of AZ91 magnesium alloy after PEO treatment using molybdate salts and low current densities

    NASA Astrophysics Data System (ADS)

    Pezzato, Luca; Brunelli, Katya; Napolitani, Enrico; Magrini, Maurizio; Dabalà, Manuele

    2015-12-01

    Plasma electrolytic oxidation (PEO) process is a recently developed electrochemical method used to produce on the surface of various metals oxide ceramic coatings that improve corrosion and wear properties of the substrate. In this work, PEO process was applied on AZ91 magnesium alloy using low current densities (0.05 A/cm2) and an alkaline solution of silicates with different concentrations of sodium molybdate (0.3-3 g/l). The effect of the low current densities of process and of molybdate salts on the corrosion resistance of the coatings was studied with potentiodynamic polarization tests and electrochemical impedance spectroscopy (EIS) in chloride and sulfate environment. The morphology, the phases and the chemical composition of the coatings were examined using a scanning electron microscope equipped with EDS, X-ray diffraction, secondary ion mass spectrometry and X-ray photoelectron spectroscopy. The corrosion properties of the PEO coated samples were remarkably improved if compared with the uncoated samples. The addition of sodium molybdate, in determinate conditions, had a positive effect on the characteristics of the coatings in terms of corrosion resistance.

  8. Silicon production process evaluations

    NASA Technical Reports Server (NTRS)

    1982-01-01

    Chemical engineering analyses involving the preliminary process design of a plant (1,000 metric tons/year capacity) to produce silicon via the technology under consideration were accomplished. Major activities in the chemical engineering analyses included base case conditions, reaction chemistry, process flowsheet, material balance, energy balance, property data, equipment design, major equipment list, production labor and forward for economic analysis. The process design package provided detailed data for raw materials, utilities, major process equipment and production labor requirements necessary for polysilicon production in each process.

  9. Method and apparatus for monitoring plasma processing operations

    DOEpatents

    Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise

    2001-01-01

    The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

  10. Method and apparatus for monitoring plasma processing operations

    DOEpatents

    Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise

    2001-01-01

    The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discemible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

  11. Method and apparatus for monitoring plasma processing operations

    DOEpatents

    Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise

    2000-01-01

    The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

  12. Method and apparatus for monitoring plasma processing operations

    DOEpatents

    Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise

    2002-07-16

    The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.

  13. Energy Conversion Alternatives Study (ECAS), Westinghouse phase 1. Volume 3: Combustors, furnaces and low-BTU gasifiers. [used in coal gasification and coal liquefaction (equipment specifications)

    NASA Technical Reports Server (NTRS)

    Hamm, J. R.

    1976-01-01

    Information is presented on the design, performance, operating characteristics, cost, and development status of coal preparation equipment, combustion equipment, furnaces, low-Btu gasification processes, low-temperature carbonization processes, desulfurization processes, and pollution particulate removal equipment. The information was compiled for use by the various cycle concept leaders in determining the performance, capital costs, energy costs, and natural resource requirements of each of their system configurations.

  14. Influence of Different Container Closure Systems and Capping Process Parameters on Product Quality and Container Closure Integrity (CCI) in GMP Drug Product Manufacturing.

    PubMed

    Mathaes, Roman; Mahler, Hanns-Christian; Roggo, Yves; Huwyler, Joerg; Eder, Juergen; Fritsch, Kamila; Posset, Tobias; Mohl, Silke; Streubel, Alexander

    2016-01-01

    Capping equipment used in good manufacturing practice manufacturing features different designs and a variety of adjustable process parameters. The overall capping result is a complex interplay of the different capping process parameters and is insufficiently described in literature. It remains poorly studied how the different capping equipment designs and capping equipment process parameters (e.g., pre-compression force, capping plate height, turntable rotating speed) contribute to the final residual seal force of a sealed container closure system and its relation to container closure integrity and other drug product quality parameters. Stopper compression measured by computer tomography correlated to residual seal force measurements.In our studies, we used different container closure system configurations from different good manufacturing practice drug product fill & finish facilities to investigate the influence of differences in primary packaging, that is, vial size and rubber stopper design on the capping process and the capped drug product. In addition, we compared two large-scale good manufacturing practice manufacturing capping equipment and different capping equipment settings and their impact on product quality and integrity, as determined by residual seal force.The capping plate to plunger distance had a major influence on the obtained residual seal force values of a sealed vial, whereas the capping pre-compression force and the turntable rotation speed showed only a minor influence on the residual seal force of a sealed vial. Capping process parameters could not easily be transferred from capping equipment of different manufacturers. However, the residual seal force tester did provide a valuable tool to compare capping performance of different capping equipment. No vial showed any leakage greater than 10(-8)mbar L/s as measured by a helium mass spectrometry system, suggesting that container closure integrity was warranted in the residual seal force range tested for the tested container closure systems. Capping equipment used in good manufacturing practice manufacturing features different designs and a variety of adjustable process parameters. The overall capping result is a complex interplay of the different capping process parameters and is insufficiently described in the literature. It remains poorly studied how the different capping equipment designs and capping equipment process parameters contribute to the final capping result.In this study, we used different container closure system configurations from different good manufacturing process drug product fill & finish facilities to investigate the influence of the vial size and the rubber stopper design on the capping process. In addition, we compared two examples of large-scale good manufacturing process capping equipment and different capping equipment settings and their impact on product quality and integrity, as determined by residual seal force. © PDA, Inc. 2016.

  15. Plasma Braking Due to External Magnetic Perturbations

    NASA Astrophysics Data System (ADS)

    Frassinetti, L.; Olofsson, Kejo; Brunsell, P. R.; Khan, M. W. M.; Drake, J. R.

    2010-11-01

    The RFP EXTRAP T2R is equipped with a comprehensive active feedback system (128 active saddle coils in the full-coverage array) and active control of both resonant and non-resonant MHD modes has been demonstrated. The feedback algorithms, based on modern control methodology such as reference mode tracking (both amplitude and phase), are a useful tool to improve the ``state of the art'' of the MHD mode control. But this tool can be used also to improve the understanding and the characterization of other phenomena such as the ELM mitigation with a resonant magnetic perturbation or the plasma viscosity. The present work studies plasma and mode braking due to static RMPs. Results show that a static RMP produces a global braking of the flow profile. The study of the effect of RMPs characterized by different helicities will also give information on the plasma viscosity profile. Experimental results are finally compared to theoretical models.

  16. Perturbations of ionosphere-magnetosphere coupling by powerful VLF emissions from ground-based transmitters

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Belov, A. S., E-mail: alexis-belov@yandex.ru; Markov, G. A.; Ryabov, A. O.

    The characteristics of the plasma-wave disturbances stimulated in the near-Earth plasma by powerful VLF radiation from ground-based transmitters are investigated. Radio communication VLF transmitters of about 1 MW in power are shown to produce artificial plasma-wave channels (density ducts) in the near-Earth space that originate in the lower ionosphere above the disturbing emission source and extend through the entire ionosphere and magnetosphere of the Earth along the magnetic field lines. Measurements with the onboard equipment of the DEMETER satellite have revealed that under the action of emission from the NWC transmitter, which is one of the most powerful VLF radiomore » transmitters, the generation of quasi-electrostatic (plasma) waves is observed on most of the satellite trajectory along the disturbed magnetic flux tube. This may probably be indicative of stimulated emission of a magnetospheric maser.« less

  17. Technical and Economical Aspects of Current Thermal Barrier Coating Systems for Gas Turbine Engines by Thermal Spray and EBPVD: A Review

    NASA Astrophysics Data System (ADS)

    Feuerstein, Albert; Knapp, James; Taylor, Thomas; Ashary, Adil; Bolcavage, Ann; Hitchman, Neil

    2008-06-01

    The most advanced thermal barrier coating (TBC) systems for aircraft engine and power generation hot section components consist of electron beam physical vapor deposition (EBPVD) applied yttria-stabilized zirconia and platinum modified diffusion aluminide bond coating. Thermally sprayed ceramic and MCrAlY bond coatings, however, are still used extensively for combustors and power generation blades and vanes. This article highlights the key features of plasma spray and HVOF, diffusion aluminizing, and EBPVD coating processes. The coating characteristics of thermally sprayed MCrAlY bond coat as well as low density and dense vertically cracked (DVC) Zircoat TBC are described. Essential features of a typical EBPVD TBC coating system, consisting of a diffusion aluminide and a columnar TBC, are also presented. The major coating cost elements such as material, equipment and processing are explained for the different technologies, with a performance and cost comparison given for selected examples.

  18. Microstructure and phase analysis of Zirconia-ODS (Oxide Dispersion Strengthen) alloy sintered by APS with milling time variation

    NASA Astrophysics Data System (ADS)

    Sugeng, Bambang; Bandriyana, B.; Sugeng, Bambang; Salam, Rohmad; Sumariyo; Sujatno, Agus; Dimyati, Arbi

    2018-03-01

    Investigation on the relationship between the process conditions of milling time and the microstructure on the synthesis of the zirconia-ODS steel alloy has been performed. The elemental composition of the alloy was determined on 20 wt% Cr and zirconia dispersoid of 0.50 wt%. The synthesis was carried out by powder metallurgy method with milling time of 3, 5 and 7 hours, static compression of 20 Ton and sintering process for 4 minutes using the APS (Arc Plasma Sintering) equipment. SEM-EDX and XRD test was carried out to characterize the phase and morphology of the alloy and the effect to the mechanical properties was evaluated by the Vickers Hardness testing. The synthesis produced sample of ODS steel with good dense and very little porous with the Fe-Cr phase that clearly observed in the XRD peak pattern. In addition milling time increased the homogeneously of Fe-Cr phase formulation, enhanced the grain refinement of the structure and increase the hardness of the alloy.

  19. Practical and highly sensitive elemental analysis for aqueous samples containing metal impurities employing electrodeposition on indium-tin oxide film samples and laser-induced shock wave plasma in low-pressure helium gas.

    PubMed

    Kurniawan, Koo Hendrik; Pardede, Marincan; Hedwig, Rinda; Abdulmadjid, Syahrun Nur; Lahna, Kurnia; Idris, Nasrullah; Jobiliong, Eric; Suyanto, Hery; Suliyanti, Maria Margaretha; Tjia, May On; Lie, Tjung Jie; Lie, Zener Sukra; Kurniawan, Davy Putra; Kagawa, Kiichiro

    2015-09-01

    We have conducted an experimental study exploring the possible application of laser-induced breakdown spectroscopy (LIBS) for practical and highly sensitive detection of metal impurities in water. The spectrochemical measurements were carried out by means of a 355 nm Nd-YAG laser within N2 and He gas at atmospheric pressures as high as 2 kPa. The aqueous samples were prepared as thin films deposited on indium-tin oxide (ITO) glass by an electrolysis process. The resulting emission spectra suggest that concentrations at parts per billion levels may be achieved for a variety of metal impurities, and it is hence potentially feasible for rapid inspection of water quality in the semiconductor and pharmaceutical industries, as well as for cooling water inspection for possible leakage of radioactivity in nuclear power plants. In view of its relative simplicity, this LIBS equipment offers a practical and less costly alternative to the standard use of inductively coupled plasma-mass spectrometry (ICP-MS) for water samples, and its further potential for in situ and mobile applications.

  20. Decontamination of prions in a plasma product manufacturing environment.

    PubMed

    Bellon, Anne; Comoy, Emmanuel; Simoneau, Steve; Mornac, Sandrine; Dehen, Capucine; Perrin, Audrey; Arzel, Aude; Arrabal, Samuel; Baron, Henry; Laude, Hubert; You, Bruno; Deslys, Jean-Philippe; Flan, Benoit

    2014-04-01

    The high resistance of prions to inactivating treatments requires the proper management of decontaminating procedures of equipment in contact with materials of human or animal origin destined for medical purposes. Sodium hydroxide (NaOH) is widely used today for this purpose as it inactivates a wide variety of pathogens including prions. Several NaOH treatments were tested on prions bound to either stainless steel or chromatographic resins in industrial conditions with multiple prion strains. Data show a strong correlation between inactivation results obtained by immunochemical detection of the prion protein and those obtained with infectivity assays and establish effective inactivation treatments for prions bound to stainless steel or chromatographic resins (ion exchange and affinity), including treatments with lower NaOH concentrations. Furthermore, no obvious strain-specific behavior difference was observed between experimental models. The results generated by these investigations show that industrial NaOH decontamination regimens (in combination with the NaCl elution in the case of the chromatography process) attain substantial prion inactivation and/or removal between batches, thus providing added assurance to the biologic safety of the final plasma-derived medicinal products. © 2013 American Association of Blood Banks.

  1. Very-low-energy-spread ion sources

    NASA Astrophysics Data System (ADS)

    Lee, Y.

    1997-05-01

    Ion beams with low axial energy spread are required in many applications such as ion projection lithography, isobaric separation in radioactive ion beam experiments, and ion beam deposition processes. In an ion source, the spread of the axial ion energy is caused by the nonuniformity of the plasma potential distribution along the source axis. Multicusp ion sources are capable of production positive and negative ions with good beam quality and relatively low energy spread. By intorducing a magnetic filter inside the multicusp source chamber, the axial plasma potential distribution is modified and the energy spread of positive hydrogen ions can be reduced to as low as 1 eV. The energy spread measurements of multicusp sources have been conducted by employing three different techniques: an electrostatic energy analyzer at the source exit; a magnetic deflection spectrometer; and a retarding-field energy analyzer for the accelerated beam. These different measurements confirmed tha! t ! the axial energy spread of positive and negative ions generated in the filter-equipped multicusp sources are small. New ion source configurations are now being investigated at LBNL with the purpose of achieving enen lower energy spread (<1eV) and of maximizing source performance such as reliability and lifetime.

  2. Influences of pretreatment and hard baking on the mechanical reliability of SU-8 microstructures

    NASA Astrophysics Data System (ADS)

    Morikaku, Toshiyuki; Kaibara, Yoshinori; Inoue, Masatoshi; Miura, Takuya; Suzuki, Takaaki; Oohira, Fumikazu; Inoue, Shozo; Namazu, Takahiro

    2013-10-01

    In this paper, the influences of pretreatment and hard baking on the mechanical characteristics of SU-8 microstructures are described. Four types of samples with different combinations of O2 plasma ashing, primer coating and hard baking were prepared for shear strength tests and uniaxial tensile tests. Specially developed shear test equipment was used to experimentally measure the shear adhesion strength of SU-8 micro posts on a glass substrate. The adhesiveness was strengthened by hard baking at 200 °C for 60 min, whereas other pretreatment processes hardly affected the strength. The pretreatment and hard baking effects on the adhesive strength were compared with those on the fracture strength measured by uniaxial tensile testing. There were no influences of O2 plasma ashing on both the strengths, and primer coating affected only tensile strength. The primer coating effect as well as the hard baking effect on stress relaxation phenomena in uniaxial tension was observed as well. Fourier transform infrared spectroscopy demonstrated that surface degradation and epoxide-ring opening polymerization would have given rise to the primer coating effect and the hard baking effect on the mechanical characteristics, respectively.

  3. Dynamics of the process boom machine working equipment under the real law of the hydraulic distributor electric spool control

    NASA Astrophysics Data System (ADS)

    Tarasov, V. N.; Boyarkina, I. V.

    2017-06-01

    Analytical calculation methods of dynamic processes of the self-propelled boom hydraulic machines working equipment are more preferable in comparison with numerical methods. The analytical research method of dynamic processes of the boom hydraulic machines working equipment by means of differential equations of acceleration and braking of the working equipment is proposed. The real control law of a hydraulic distributor electric spool is considered containing the linear law of the electric spool activation and stepped law of the electric spool deactivation. Dependences of dynamic processes of the working equipment on reduced mass, stiffness of hydraulic power cylinder, viscous drag coefficient, piston acceleration, pressure in hydraulic cylinders, inertia force are obtained. Definite recommendations relative to the reduction of dynamic loads, appearing during the working equipment control are considered as the research result. The nature and rate of parameter variations of the speed and piston acceleration dynamic process depend on the law of the ports opening and closure of the hydraulic distributor electric spool. Dynamic loads in the working equipment are decreased during a smooth linear activation of the hydraulic distributor electric spool.

  4. A novel approach to the pacemaker infection with non-thermal atmospheric pressure plasma

    NASA Astrophysics Data System (ADS)

    Zhang, Yuchen; Li, Yu; Li, Yinglong; Yu, Shuang; Li, Haiyan; Zhang, Jue

    2017-08-01

    Although the pacemaker (PM) is a key cardiac implantable electrical device for life-threatening arrhythmias treatment, the related infection is a challenge. Thus, the aim of this study is to validate cold plasma as a potential technology for the disinfection of infected pacemakers. Fifty donated PMs were cleaned and sterilized before use and then infected with Staphylococcus aureus ( S. aureus). Then, each experimental group was treated with cold plasma treatment for 1 min, 3 min, 5 min and 7 min, while the control group was immersed with sterilized water. Effectiveness of disinfection was evaluated by using CFU counting method and confocal laser scanning microscopy (CLSM). The physicochemical properties of water treated with cold plasma at different time were evaluated, including water temperature change and oxidation reduction potential (ORP). The major reactive species generated by the cold plasma equipment during cold plasma were analyzed with optical emission spectroscopy (OES). No live bacteria were detected with CFU counting method after 7 min of cold plasma treatment, which matches with the CLSM results. The ORP value of water and H2O2 concentration changed significantly after treating with cold plasma. Furthermore, reactive oxygen species (ROS) and reactive nitrogen species (RNS), especially NO, O (777 nm) and O (844 nm) were probably key inactivation agents in cold plasma treatment. These results indicate that cold plasma could be an effective technology for the disinfection of implantable devices.

  5. High-Voltage MOSFET Switching Circuit

    NASA Technical Reports Server (NTRS)

    Jensen, Kenneth A.

    1995-01-01

    Circuit reliably switches power at supply potential of minus 1,500 V, with controlled frequency and duty cycle. Used in argon-plasma ion-bombardment equipment for texturing copper electrodes, as described in "Texturing Copper To Reduce Secondary Emission of Electrons" (LEW-15898), also adapted to use in powering gaseous flash lamps and stroboscopes.

  6. A Laboratory Course in Clinical Biochemistry Emphasizing Interest and Relevance

    ERIC Educational Resources Information Center

    Schwartz, Peter L.

    1975-01-01

    Ten laboratory experiments are described which are used in a successful clinical biochemistry laboratory course (e.g. blood alcohol, glucose tolerance, plasma triglycerides, coronary risk index, gastric analysis, vitamin C and E). Most of the experiments are performed on the students themselves using simple equipment with emphasis on useful…

  7. Biomonitoring of Environmental Status and Trends (BEST) Program: Field Procedures for Assessing the Exposure of Fish to Environmental Contaminants

    USGS Publications Warehouse

    Schmitt, Christopher J.; Blazer, Vicki; Dethloff, Gail M.; Tillitt, Donald E.; Gross, Timothy S.; Bryant, Wade L.; DeWeese, L. Rod; Smith, Stephen B.; Goede, Ronald W.; Bartish, Timothy M.; Kubiak, Timothy J.

    1999-01-01

    This document describes procedures used to collect information, tissues, and fluids for documenting the exposure of fish to environmental contaminants. For the procedures described here, fish are captured (preferably by electrofishing) and held alive until processing (generally <1 h). Fish are weighed, measured, and examined for grossly visible external lesions and pathologies. A blood sample is collected by caudal veinipuncture using a needle and syringe. The fish is subdued and it's abdominal cavity opened. The internal organs are dissected from the fish for examination. The sex of the fish is determined by direct observation of its gonads. The liver is weighed (most species) and cut into small cubes and flash-frozen in cryogenic vials, which are stored and shipped in dry ice or liquid nitrogen. Additional liver cubes plus all grossly visible anomalies are preserved for histopathology. The gonads and spleen are weighed, and samples are preserved for histopathology. The kidneys are examined, and histopathology samples collected. A gill sample is also collected and preserved. All remaining tissues are returned to the carcass, which is wrapped in foil, labeled for chemical analysis, and chilled. Individual fish carcasses are composited by station, species, and gender; frozen; and shipped to the analytical laboratory. Procedures are also described for record keeping; processing blood to obtain serum and plasma; flash-freezing samples; cleaning equipment; and preventing the transport of living organisms among waterways. A list of necessary equipment and supplies is also provided.

  8. Cold plasma processing technology makes advances

    USDA-ARS?s Scientific Manuscript database

    Cold plasma (AKA nonthermal plasma, cool plasma, gas plasma, etc.) is a rapidly maturing antimicrobial process being developed for applications in the food industry. A wide array of devices can be used to create cold plasma, but the defining characteristic is that they operate at or near room temper...

  9. Method and apparatus for monitoring plasma processing operations

    DOEpatents

    Smith, Jr., Michael Lane; Ward, Pamela Denise Peardon; Stevenson, Joel O'Don

    2002-01-01

    The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). Another aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system. A final aspect of the present invention relates to a network a plurality of plasma monitoring systems, including with remote capabilities (i.e., outside of the clean room).

  10. Development of process data capturing, analysis and controlling for thermal spray techniques - SprayTracker

    NASA Astrophysics Data System (ADS)

    Kelber, C.; Marke, S.; Trommler, U.; Rupprecht, C.; Weis, S.

    2017-03-01

    Thermal spraying processes are becoming increasingly important in high-technology areas, such as automotive engineering and medical technology. The method offers the advantage of a local layer application with different materials and high deposition rates. Challenges in the application of thermal spraying result from the complex interaction of different influencing variables, which can be attributed to the properties of different materials, operating equipment supply, electrical parameters, flow mechanics, plasma physics and automation. In addition, spraying systems are subject to constant wear. Due to the process specification and the high demands on the produced coatings, innovative quality assurance tools are necessary. A central aspect, which has not yet been considered, is the data management in relation to the present measured variables, in particular the spraying system, the handling system, working safety devices and additional measuring sensors. Both the recording of all process-characterizing variables, their linking and evaluation as well as the use of the data for the active process control presuppose a novel, innovative control system (hardware and software) that was to be developed within the scope of the research project. In addition, new measurement methods and sensors are to be developed and qualified in order to improve the process reliability of thermal spraying.

  11. Low pressure and high power rf sources for negative hydrogen ions for fusion applications (ITER neutral beam injection).

    PubMed

    Fantz, U; Franzen, P; Kraus, W; Falter, H D; Berger, M; Christ-Koch, S; Fröschle, M; Gutser, R; Heinemann, B; Martens, C; McNeely, P; Riedl, R; Speth, E; Wünderlich, D

    2008-02-01

    The international fusion experiment ITER requires for the plasma heating and current drive a neutral beam injection system based on negative hydrogen ion sources at 0.3 Pa. The ion source must deliver a current of 40 A D(-) for up to 1 h with an accelerated current density of 200 Am/(2) and a ratio of coextracted electrons to ions below 1. The extraction area is 0.2 m(2) from an aperture array with an envelope of 1.5 x 0.6 m(2). A high power rf-driven negative ion source has been successfully developed at the Max-Planck Institute for Plasma Physics (IPP) at three test facilities in parallel. Current densities of 330 and 230 Am/(2) have been achieved for hydrogen and deuterium, respectively, at a pressure of 0.3 Pa and an electron/ion ratio below 1 for a small extraction area (0.007 m(2)) and short pulses (<4 s). In the long pulse experiment, equipped with an extraction area of 0.02 m(2), the pulse length has been extended to 3600 s. A large rf source, with the width and half the height of the ITER source but without extraction system, is intended to demonstrate the size scaling and plasma homogeneity of rf ion sources. The source operates routinely now. First results on plasma homogeneity obtained from optical emission spectroscopy and Langmuir probes are very promising. Based on the success of the IPP development program, the high power rf-driven negative ion source has been chosen recently for the ITER beam systems in the ITER design review process.

  12. Fatigue test results of the rotating steel blades of steam turbine K-25-0.6 GEO with ion-plasma coating

    NASA Astrophysics Data System (ADS)

    Kachalin, G. V.; Mednikov, A. F.; Tkhabisimov, A. B.; Arkad'ev, D. A.; Temkin, S. G.; Senina, N. A.

    2016-12-01

    Fatigue test results of the rotating steel blades of the fourth stage of the K-25-0.6 low pressure cylinder Geo steam turbine manufactured in the Kaluga Turbine Plant (hereinafter, KTP) with the ion-plasma coating were presented. Coating formation was carried out at the National Research University (MPEI) on the Gefest vacuum pilot plant by the magnetron sputtering method. Characteristics of the obtained coating were analyzed with the use of the scientific-research equipment of the National Research University (MPEI). Fatigue tests of the rotating blades and determination of the fatigue strength of the material with the ion-plasma coating were carried out on the electrodynamic vibration machines VEDS-400A in the KTP structural laboratory. The following characteristics were obtained after tests: Ti-TiN composition, 10-11 μm thickness, 1200 HV 0.05 microhardness. Fatigue tests showed that destruction, regardless of availability or nonavailability of the coating, took place by cross-section in the root zone both on the leading and trailing edges of the blade, i.e., in the most stressed zones. It was found out that the maximum stresses during tests were revealed in the root section along the trailing edge on the blade pressure side, and the less stresses were on the leading edge. Fatigue strength of the working blades after coating formation increased by 12% minimum. Results of the fatigue tests prove the previously obtained data concerning 10-12% increase of the fatigue strength of the blade steel with the ion-plasma coating and allow claiming that the process of their formation exerts the positive influence on the fatigue characteristics of the blade materials.

  13. 40 CFR 61.181 - Definitions.

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... cooled, condensed, and removed in a solid form. Control device means the air pollution control equipment... failure of air pollution control equipment or process equipment or of a process to operate in a normal or... Protection of Environment ENVIRONMENTAL PROTECTION AGENCY (CONTINUED) AIR PROGRAMS (CONTINUED) NATIONAL...

  14. 40 CFR 61.181 - Definitions.

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... cooled, condensed, and removed in a solid form. Control device means the air pollution control equipment... failure of air pollution control equipment or process equipment or of a process to operate in a normal or... Protection of Environment ENVIRONMENTAL PROTECTION AGENCY (CONTINUED) AIR PROGRAMS (CONTINUED) NATIONAL...

  15. 40 CFR 61.181 - Definitions.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... cooled, condensed, and removed in a solid form. Control device means the air pollution control equipment... failure of air pollution control equipment or process equipment or of a process to operate in a normal or... Protection of Environment ENVIRONMENTAL PROTECTION AGENCY (CONTINUED) AIR PROGRAMS (CONTINUED) NATIONAL...

  16. 40 CFR 61.181 - Definitions.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... cooled, condensed, and removed in a solid form. Control device means the air pollution control equipment... failure of air pollution control equipment or process equipment or of a process to operate in a normal or... Protection of Environment ENVIRONMENTAL PROTECTION AGENCY (CONTINUED) AIR PROGRAMS (CONTINUED) NATIONAL...

  17. 40 CFR 61.181 - Definitions.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... cooled, condensed, and removed in a solid form. Control device means the air pollution control equipment... failure of air pollution control equipment or process equipment or of a process to operate in a normal or... Protection of Environment ENVIRONMENTAL PROTECTION AGENCY (CONTINUED) AIR PROGRAMS (CONTINUED) NATIONAL...

  18. Space processing applications payload equipment study. Volume 2A: Experiment requirements

    NASA Technical Reports Server (NTRS)

    Smith, A. G.; Anderson, W. T., Jr.

    1974-01-01

    An analysis of the space processing applications payload equipment was conducted. The primary objective was to perform a review and an update of the space processing activity research equipment requirements and specifications that were derived in the first study. The analysis is based on the six major experimental classes of: (1) biological applications, (2) chemical processes in fluids, (3) crystal growth, (4) glass technology, (5) metallurgical processes, and (6) physical processes in fluids. Tables of data are prepared to show the functional requirements for the areas of investigation.

  19. Food processors requirements met by radiation processing

    NASA Astrophysics Data System (ADS)

    Durante, Raymond W.

    2002-03-01

    Processing food using irradiation provides significant advantages to food producers by destroying harmful pathogens and extending shelf life without any detectable physical or chemical changes. It is expected that through increased public education, food irradiation will emerge as a viable commercial industry. Food production in most countries involves state of the art manufacturing, packaging, labeling, and shipping techniques that provides maximum efficiency and profit. In the United States, food sales are extremely competitive and profit margins small. Most food producers have heavily invested in equipment and are hesitant to modify their equipment. Meat and poultry producers in particular utilize sophisticated production machinery that processes enormous volumes of product on a continuous basis. It is incumbent on the food irradiation equipment suppliers to develop equipment that can easily merge with existing processes without requiring major changes to either the final food product or the process utilized to produce that product. Before a food producer can include irradiation as part of their food production process, they must be certain the available equipment meets their needs. This paper will examine several major requirements of food processors that will most likely have to be provided by the supplier of the irradiation equipment.

  20. Plasma Processes for Semiconductor Fabrication

    NASA Astrophysics Data System (ADS)

    Hitchon, W. N. G.

    1999-01-01

    Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modeled. The author begins with an overview of plasma reactors and discusses the various models for understanding plasma processes. He then covers plasma chemistry, addressing the effects of different chemicals on the features being etched. Having presented the relevant background material, he then describes in detail the modeling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many homework exercises and serves as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practicing engineers in the semiconductor industry.

  1. Space processing applications payload equipment study. Volume 2E: Commercial equipment utility

    NASA Technical Reports Server (NTRS)

    Smith, A. G. (Editor)

    1974-01-01

    Examination of commercial equipment technologies revealed that the functional performance requirements of space processing equipment could generally be met by state-of-the-art design practices. Thus, an apparatus could be evolved from a standard item or derived by custom design using present technologies. About 15 percent of the equipment needed has no analogous commercial base of derivation and requires special development. This equipment is involved primarily with contactless heating and position control. The derivation of payloads using commercial equipment sources provides a broad and potentially cost-effective base upon which to draw. The derivation of payload equipment from commercial technologies poses other issues beyond that of the identifiable functional performance, but preliminary results on testing of selected equipment testing appear quite favorable. During this phase of the SPA study, several aspects of commercial equipment utility were assessed and considered. These included safety, packaging and structural, power conditioning (electrical/electronic), thermal and materials of construction.

  2. Decontamination of minimally invasive surgical endoscopes and accessories.

    PubMed

    Ayliffe, G

    2000-08-01

    (1) Infections following invasive endoscopy are rare and are usually of endogenous origin. Nevertheless, infections do occur due to inadequate cleaning and disinfection and the use of contaminated rinse water and processing equipment. (2) Rigid and flexible operative endoscopes and accessories should be thoroughly cleaned and preferably sterilized using properly validated processes. (3) Heat tolerant operative endoscopes and accessories should be sterilized using a vacuum assisted steam sterilizer. Use autoclavable instrument trays or containers to protect equipment during transit and processing. Small bench top sterilizers without vacuum assisted air removal are unsuitable for packaged and lumened devices. (4) Heat sensitive rigid and flexible endoscopes and accessories should preferably be sterilized using ethylene oxide, low temperature steam and formaldehyde (rigid only) or gas plasma (if appropriate). (5) If there are insufficient instruments or time to sterilize invasive endoscopes, or if no suitable method is available locally, they may be disinfected by immersion in 2% glutaraldehyde or a suitable alternative. An immersion time of at least 10 min should be adopted for glutaraldehyde. This is sufficient to inactivate most vegetative bacteria and viruses including HIV and hepatitis B virus (HBV). Longer contact times of 20 min or more may be necessary if a mycobacterial infection is known or suspected. At least 3 h immersion in glutaraldehyde is required to kill spores. (6) Glutaraldehyde is irritant and sensitizing to the skin, eyes and respiratory tract. Measures must be taken to ensure glutaraldehyde is used in a safe manner, i.e., total containment and/or extraction of harmful vapour and the provision of suitable personal protective equipment, i.e., gloves, apron and eye protection if splashing could occur. Health surveillance of staff is recommended and should include a pre-employment enquiry regarding asthma, skin and mucosal sensitivity problems and lung function testing by spirometry. (7) Possible alternative disinfectants to glutaraldehyde include peracetic acid (0.2-0.35%), chlorine dioxide (700-1100 ppm) and superoxidized water. These are very effective, killing vegetative bacteria, including mycobacteria, and viruses in 5 min and bacterial spores in 10 min. An endorsement of compatibility with endoscopes, accessories and processing equipment is required from both the solution/device manufacturer and the endoscope manufacturer. Other important considerations are stability, cost and safety from the user and environmental standpoints. (8) Cleaning and disinfection or sterilization should be undertaken by trained staff in a dedicated area, e.g., SSD or TSSU. A suitable training programme is described. (9) If endoscopes are processed by immersion in disinfectants, harmful residues must be removed by thorough rinsing. Sterile or bacteria free water is essential for rinsing all invasive endoscopes and accessories to prevent recontamination. (10) If an automated washer disinfector is used it must be effective, non-damaging, reliable, easy to use and its performance regularly monitored. (11) If used, washer disinfectors and other processing equipment should be disinfected on a regular basis, i.e., between patients or at the start of each session. This will prevent biofilm formation and recontamination of instruments during rinsing. Disinfection should include the water treatment system, if present. (12) To comply with the Medical Devices Directive, manufacturers are obliged to provide full details on how to decontaminate the reusable devices they supply. This should include details of compatibility with heat, pressure, moisture, processing chemicals and ultrasonics. (13) The Infection Control Team should always be involved in the formulation and implementation of decontamination policies. Wherever possible, the national good practice guidelines produced by the Medical Devices Agency and/or professional societies shoul

  3. In-situ plasma processing to increase the accelerating gradients of SRF cavities

    DOE PAGES

    Doleans, Marc; Afanador, Ralph; Barnhart, Debra L.; ...

    2015-12-31

    A new in-situ plasma processing technique is being developed at the Spallation Neutron Source (SNS) to improve the performance of the cavities in operation. The technique utilizes a low-density reactive oxygen plasma at room temperature to remove top surface hydrocarbons. The plasma processing technique increases the work function of the cavity surface and reduces the overall amount of vacuum and electron activity during cavity operation; in particular it increases the field emission onset, which enables cavity operation at higher accelerating gradients. Experimental evidence also suggests that the SEY of the Nb surface decreases after plasma processing which helps mitigating multipactingmore » issues. This article discusses the main developments and results from the plasma processing R&D are presented and experimental results for in-situ plasma processing of dressed cavities in the SNS horizontal test apparatus.« less

  4. Plasma Discharge Process in a Pulsed Diaphragm Discharge System

    NASA Astrophysics Data System (ADS)

    Duan, Jianjin; Hu, Jue; Zhang, Chao; Wen, Yuanbin; Meng, Yuedong; Zhang, Chengxu

    2014-12-01

    As one of the most important steps in wastewater treatment, limited study on plasma discharge process is a key challenge in the development of plasma applications. In this study, we focus on the plasma discharge process of a pulsed diaphragm discharge system. According to the analysis, the pulsed diaphragm discharge proceeds in seven stages: (1) Joule heating and heat exchange stage; (2) nucleated site formation; (3) plasma generation (initiation of the breakdown stage); (4) avalanche growth and plasma expansion; (5) plasma contraction; (6) termination of the plasma discharge; and (7) heat exchange stage. From this analysis, a critical voltage criterion for breakdown is obtained. We anticipate this finding will provide guidance for a better application of plasma discharges, especially diaphragm plasma discharges.

  5. Three-dimensional photonic crystals created by single-step multi-directional plasma etching.

    PubMed

    Suzuki, Katsuyoshi; Kitano, Keisuke; Ishizaki, Kenji; Noda, Susumu

    2014-07-14

    We fabricate 3D photonic nanostructures by simultaneous multi-directional plasma etching. This simple and flexible method is enabled by controlling the ion-sheath in reactive-ion-etching equipment. We realize 3D photonic crystals on single-crystalline silicon wafers and show high reflectance (>95%) and low transmittance (<-15dB) at optical communication wavelengths, suggesting the formation of a complete photonic bandgap. Moreover, our method simply demonstrates Si-based 3D photonic crystals that show the photonic bandgap effect in a shorter wavelength range around 0.6 μm, where further fine structures are required.

  6. Plasma technologies application for building materials surface modification

    NASA Astrophysics Data System (ADS)

    Volokitin, G. G.; Skripnikova, N. K.; Volokitin, O. G.; Shehovtzov, V. V.; Luchkin, A. G.; Kashapov, N. F.

    2016-01-01

    Low temperature arc plasma was used to process building surface materials, such as silicate brick, sand lime brick, concrete and wood. It was shown that building surface materials modification with low temperature plasma positively affects frost resistance, water permeability and chemical resistance with high adhesion strength. Short time plasma processing is rather economical than traditional processing thermic methods. Plasma processing makes wood surface uniquely waterproof and gives high operational properties, dimensional and geometrical stability. It also increases compression resistance and decreases inner tensions level in material.

  7. An Atmospheric Pressure Plasma Setup to Investigate the Reactive Species Formation.

    PubMed

    Gorbanev, Yury; Soriano, Robert; O'Connell, Deborah; Chechik, Victor

    2016-11-03

    Non-thermal atmospheric pressure ('cold') plasmas have received increased attention in recent years due to their significant biomedical potential. The reactions of cold plasma with the surrounding atmosphere yield a variety of reactive species, which can define its effectiveness. While efficient development of cold plasma therapy requires kinetic models, model benchmarking needs empirical data. Experimental studies of the source of reactive species detected in aqueous solutions exposed to plasma are still scarce. Biomedical plasma is often operated with He or Ar feed gas, and a specific interest lies in investigation of the reactive species generated by plasma with various gas admixtures (O2, N2, air, H2O vapor, etc.) Such investigations are very complex due to difficulties in controlling the ambient atmosphere in contact with the plasma effluent. In this work, we addressed common issues of 'high' voltage kHz frequency driven plasma jet experimental studies. A reactor was developed allowing the exclusion of ambient atmosphere from the plasma-liquid system. The system thus comprised the feed gas with admixtures and the components of the liquid sample. This controlled atmosphere allowed the investigation of the source of the reactive oxygen species induced in aqueous solutions by He-water vapor plasma. The use of isotopically labelled water allowed distinguishing between the species originating in the gas phase and those formed in the liquid. The plasma equipment was contained inside a Faraday cage to eliminate possible influence of any external field. The setup is versatile and can aid in further understanding the cold plasma-liquid interactions chemistry.

  8. An Atmospheric Pressure Plasma Setup to Investigate the Reactive Species Formation

    PubMed Central

    Gorbanev, Yury; Soriano, Robert; O'Connell, Deborah; Chechik, Victor

    2016-01-01

    Non-thermal atmospheric pressure ('cold') plasmas have received increased attention in recent years due to their significant biomedical potential. The reactions of cold plasma with the surrounding atmosphere yield a variety of reactive species, which can define its effectiveness. While efficient development of cold plasma therapy requires kinetic models, model benchmarking needs empirical data. Experimental studies of the source of reactive species detected in aqueous solutions exposed to plasma are still scarce. Biomedical plasma is often operated with He or Ar feed gas, and a specific interest lies in investigation of the reactive species generated by plasma with various gas admixtures (O2, N2, air, H2O vapor, etc.) Such investigations are very complex due to difficulties in controlling the ambient atmosphere in contact with the plasma effluent. In this work, we addressed common issues of 'high' voltage kHz frequency driven plasma jet experimental studies. A reactor was developed allowing the exclusion of ambient atmosphere from the plasma-liquid system. The system thus comprised the feed gas with admixtures and the components of the liquid sample. This controlled atmosphere allowed the investigation of the source of the reactive oxygen species induced in aqueous solutions by He-water vapor plasma. The use of isotopically labelled water allowed distinguishing between the species originating in the gas phase and those formed in the liquid. The plasma equipment was contained inside a Faraday cage to eliminate possible influence of any external field. The setup is versatile and can aid in further understanding the cold plasma-liquid interactions chemistry. PMID:27842375

  9. Plasma chemistry study of PLAD processes

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Qin Shu; Brumfield, Kyle; Liu, Lequn Jennifer

    2012-11-06

    Plasma doping (PLAD) shows very different impurity profiles compared to the conventional beam-line-based ion implantations due to its non-mass separation property and plasma environment. There is no simulation for PLAD process so far due to a lack of a dopant profile model. Several factors determine impurity profiles of PLAD process. The most significant factors are: plasma chemistry and deposition/etching characteristics of multi-ion species plasmas. In this paper, we present plasma chemistry and deposition/etching characteristics of PLAD processes versus co-gas dilutions. Four dopant plasmas including B{sub 2}H{sub 6}, BF{sub 3}, AsH{sub 3}, and PH{sub 3}, and two non-dopant plasmas including CH{submore » 4} and GeH{sub 4} are studied and demonstrated.« less

  10. Pulsatile plasma filtration and cell-free DNA amplification using a water-head-driven point-of-care testing chip.

    PubMed

    Lee, Yonghun; Kim, Dong-Min; Li, Zhenglin; Kim, Dong-Eun; Kim, Sung-Jin

    2018-03-13

    We demonstrate a microfiltration chip that separates blood plasma by using water-head-driven pulsatile pressures rather than any external equipment and use it for on-chip amplification of nucleic acids. The chip generates pulsatile pressures to significantly reduce filter clogging without hemolysis, and consists of an oscillator, a plasma-extraction pump, and filter units. The oscillator autonomously converts constant water-head pressure to pulsatile pressure, and the pump uses the pulsatile pressure to extract plasma through the filter. Because the pulsatile pressure can periodically clear blood cells from the filter surface, filter clogging can be effectively reduced. In this way, we achieve plasma extraction with 100% purity and 90% plasma recovery at 15% hematocrit. During a 10 min period, the volume of plasma extracted was 43 μL out of a 243 μL extraction volume at 15% hematocrit. We also studied the influence of the pore size and diameter of the filter, blood loading volume, oscillation period, and hematocrit level on the filtration performance. To demonstrate the utility of our chip for point-of-care testing (POCT) applications, we successfully implemented on-chip amplification of a nucleic acid (miDNA21) in plasma filtered from blood. We expect our chip to be useful not only for POCT applications but also for other bench-top analysis tools using blood plasma.

  11. Identification of S VIII through S XIV emission lines between 17.5 and 50 nm in a magnetically confined plasma

    NASA Astrophysics Data System (ADS)

    McCarthy, K. J.; Tamura, N.; Combs, S. K.; García, R.; Hernández Sánchez, J.; Navarro, M.; Panadero, N.; Pastor, I.; Soleto, A.; the TJ-II Team

    2018-03-01

    43 spectral emission lines from F-like to Li-like sulphur ions have been identified in the wavelength range from 17.5 to 50 nm in spectra obtained following tracer injection into plasmas created in a magnetically confined plasma device, the stellarator TJ-II. Plasmas created and maintained in this heliac device with electron cyclotron resonance heating achieve central electron temperatures and densities up to 1.5 keV and 8 × 1018 m-3, respectively. Tracer injections were performed with ≤6 × 1016 atoms of sulphur contained within ˜300 μm diameter polystyrene capsules, termed tracer encapsulated solid pellets, using a gas propulsion system to achieve velocities between 250 and 450 m s-1. Once ablation of the exterior polystyrene shell by plasma particles is completed, the sulphur is deposited in the plasma core where it is ionized up to S+13 and transported about the plasma. In order to aid line identification, which is made using a number of atomic line emission databases, spectra are collected before and after injection using a 1 m focal length normal incidence spectrometer equipped with a CCD camera. This work is motivated by the need to clearly identify sulphur emission lines in the vacuum ultraviolet range of magnetically confined plasmas, as sulphur x-ray emission lines are regularly observed in both tokamak and stellarator plasmas.

  12. Simultaneous determination of three major lignans in rat plasma by LC-MS/MS and its application to a pharmacokinetic study after oral administration of Diphylleia sinensis extract.

    PubMed

    Zhao, Chengliang; Zhang, Nan; He, Weiyan; Li, Rui; Shi, Dan; Pang, Li; Dong, Ning; Xu, Hong; Ji, Honglei

    2014-04-01

    A sensitive and selective liquid chromatography tandem mass spectrometry was developed and validated for the simultaneous determination of three major lignans (podophyllotoxin, epipodophyllotoxin, and 4'-demethylpodophyllotoxin) in rat plasma using diphenhydramine as the internal standard. The analytes were detected using a triple quadrupole mass spectrometer that was equipped with an electrospray ionization source in the positive ion and selected reaction monitoring modes. The linearity of the calibration curve was good, with coefficients of determination (r(2) ) >0.9914 for all of the analytes. The developed method was successfully applied for the simultaneous determination of the three lignans in rat plasma following oral administration of Diphylleia sinensis extract to rats. Copyright © 2013 John Wiley & Sons, Ltd.

  13. 21 CFR 640.54 - Processing.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Cryoprecipitate § 640.54 Processing. (a) Processing the plasma. (1) The plasma shall be separated from the red blood cells by centrifugation to obtain essentially cell-free plasma. (2) The plasma shall be placed in a freezer within 8 hours after blood collection or...

  14. 21 CFR 640.54 - Processing.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Cryoprecipitate § 640.54 Processing. (a) Processing the plasma. (1) The plasma shall be separated from the red blood cells by centrifugation to obtain essentially cell-free plasma. (2) The plasma shall be placed in a freezer within 8 hours after blood collection or...

  15. 21 CFR 640.54 - Processing.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Cryoprecipitate § 640.54 Processing. (a) Processing the plasma. (1) The plasma shall be separated from the red blood cells by centrifugation to obtain essentially cell-free plasma. (2) The plasma shall be placed in a freezer within 8 hours after blood collection or...

  16. 21 CFR 640.54 - Processing.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Cryoprecipitate § 640.54 Processing. (a) Processing the plasma. (1) The plasma shall be separated from the red blood cells by centrifugation to obtain essentially cell-free plasma. (2) The plasma shall be placed in a freezer within 8 hours after blood collection or...

  17. 21 CFR 640.54 - Processing.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Cryoprecipitate § 640.54 Processing. (a) Processing the plasma. (1) The plasma shall be separated from the red blood cells by centrifugation to obtain essentially cell-free plasma. (2) The plasma shall be placed in a freezer within 8 hours after blood collection or...

  18. Plasma, The Fourth State of Matter

    ERIC Educational Resources Information Center

    Zandy, Hassan F.

    1970-01-01

    Discusses plasma as a source of energy through nuclear fission processes, as well as the difficulties encountered in such a process. States that 99 percent of the matter in the universe is plasma, and only 1 percent is the common three states of matter. Describes the fundamental properties of plasma, plasma "pinch, and plasma oscillations. (RR)

  19. 41 CFR 109-50.203 - Eligible equipment.

    Code of Federal Regulations, 2014 CFR

    2014-01-01

    ... 50-SPECIAL DOE DISPOSAL AUTHORITIES 50.2-Math and Science Equipment Gift Program § 109-50.203... and Laboratory Equipment. 67Photographic Equipment. 70General Purpose Automatic Data Processing...

  20. 41 CFR 109-50.203 - Eligible equipment.

    Code of Federal Regulations, 2012 CFR

    2012-01-01

    ... 50-SPECIAL DOE DISPOSAL AUTHORITIES 50.2-Math and Science Equipment Gift Program § 109-50.203... and Laboratory Equipment. 67Photographic Equipment. 70General Purpose Automatic Data Processing...

  1. 41 CFR 109-50.203 - Eligible equipment.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... 50-SPECIAL DOE DISPOSAL AUTHORITIES 50.2-Math and Science Equipment Gift Program § 109-50.203... and Laboratory Equipment. 67Photographic Equipment. 70General Purpose Automatic Data Processing...

  2. 41 CFR 109-50.203 - Eligible equipment.

    Code of Federal Regulations, 2011 CFR

    2011-01-01

    ... 50-SPECIAL DOE DISPOSAL AUTHORITIES 50.2-Math and Science Equipment Gift Program § 109-50.203... and Laboratory Equipment. 67Photographic Equipment. 70General Purpose Automatic Data Processing...

  3. Economy in Government: Automatic Data Processing Equipment; Report of the Subcommittee on Priorities and Economy in Government . . . Together with Supplemental Views.

    ERIC Educational Resources Information Center

    Joint Economic Committee, Washington, DC.

    This report is based on hearings that the subcommittee held on July 1, 1970, entitled "Economy in Government Property Management--Procurement of Data Processing Equipment" as well as General Accounting Office and General Services Administration reports. It focuses upon the phenomenal growth in the use of automatic data processing equipment by the…

  4. The INAF/IAPS Plasma Chamber for ionospheric simulation experiment

    NASA Astrophysics Data System (ADS)

    Diego, Piero

    2016-04-01

    The plasma chamber is particularly suitable to perform studies for the following applications: - plasma compatibility and functional tests on payloads envisioned to operate in the ionosphere (e.g. sensors onboard satellites, exposed to the external plasma environment); - calibration/testing of plasma diagnostic sensors; - characterization and compatibility tests on components for space applications (e.g. optical elements, harness, satellite paints, photo-voltaic cells, etc.); - experiments on satellite charging in a space plasma environment; - tests on active experiments which use ion, electron or plasma sources (ion thrusters, hollow cathodes, field effect emitters, plasma contactors, etc.); - possible studies relevant to fundamental space plasma physics. The facility consists of a large volume vacuum tank (a cylinder of length 4.5 m and diameter 1.7 m) equipped with a Kaufman type plasma source, operating with Argon gas, capable to generate a plasma beam with parameters (i.e. density and electron temperature) close to the values encountered in the ionosphere at F layer altitudes. The plasma beam (A+ ions and electrons) is accelerated into the chamber at a velocity that reproduces the relative motion between an orbiting satellite and the ionosphere (≈ 8 km/s). This feature, in particular, allows laboratory simulations of the actual compression and depletion phenomena which take place in the ram and wake regions around satellites moving through the ionosphere. The reproduced plasma environment is monitored using Langmuir Probes (LP) and Retarding Potential Analyzers (RPA). These sensors can be automatically moved within the experimental space using a sled mechanism. Such a feature allows the acquisition of the plasma parameters all around the space payload installed into the chamber for testing. The facility is currently in use to test the payloads of CSES satellite (Chinese Seismic Electromagnetic Satellite) devoted to plasma parameters and electric field measurements in a polar orbit at 500 km altitude.

  5. IN VIVO AND IN VITRO ANTI-ANDROGENIC EFFECTS OF DE-71, A COMMERCIAL POLYBROMINATED DIPHENYL ETHER (PBDE) MIXTURE

    EPA Science Inventory

    PBDEs have been synthesized in large quantities as flame retardants for commercial products, such as electronic equipment and textiles. The rising in levels of PBDEs in tissues in wildlife species and in human milk and plasma samples over the past several years have raised conce...

  6. Use of an Interactive General-Purpose Computer Terminal to Simulate Training Equipment Operation.

    ERIC Educational Resources Information Center

    Lahey, George F.; And Others

    Trainees from Navy Basic Electricity/Electronics School were assigned to receive either computer-assisted instruction (CAI) or conventional individualized instruction in a segment of a course requiring use of a multimeter to measure resistance and current flow. The (CAI) group used PLATO IV plasma-screen terminals; individualized instruction…

  7. Determination of low concentrations of iron, arsenic, selenium, cadmium, and other trace elements in natural samples using an octopole collision/reaction cell equipped quadrupole-inductively coupled plasma mass spectrometer.

    PubMed

    Dial, Angela R; Misra, Sambuddha; Landing, William M

    2015-04-30

    Accurate determination of trace metals has many applications in environmental and life sciences, such as constraining the cycling of essential micronutrients in biological production and employing trace metals as tracers for anthropogenic pollution. Analysis of elements such as Fe, As, Se, and Cd is challenged by the formation of polyatomic mass spectrometric interferences, which are overcome in this study. We utilized an Octopole Collision/Reaction Cell (CRC)-equipped Quadrupole-Inductively Coupled Plasma Mass Spectrometer for the rapid analysis of small volume samples (~250 μL) in a variety of matrices containing HNO3 and/or HCl. Efficient elimination of polyatomic interferences was demonstrated by the use of the CRC in Reaction Mode (RM; H2 gas) and in Collision-Reaction Mode (CRM; H2 and He gas), in addition to hot plasma (RF power 1500 W) and cool plasma (600 W) conditions. It was found that cool plasma conditions with RM achieved the greatest signal sensitivity while maintaining low detection limits (i.e. (56) Fe in 0.44 M HNO3 has a sensitivity of 160,000 counts per second (cps)-per-1 µg L(-1) and a limit of detection (LoD) of 0.86 ng L(-1) ). The average external precision was ≤ ~10% for minor (≤10 µg L(-1) ) elements measured in a 1:100 dilution of NIST 1643e and for iron in rainwater samples under all instrumental operating conditions. An improved method has been demonstrated for the rapid multi-element analysis of trace metals that are challenged by polyatomic mass spectrometric interferences, with a focus on (56) Fe, (75) As, (78) Se and (111) Cd. This method can contribute to aqueous environmental geochemistry and chemical oceanography, as well as other fields such as forensic chemistry, agriculture, food chemistry, and pharmaceutical sciences. Copyright © 2015 John Wiley & Sons, Ltd.

  8. Automated plasma control with optical emission spectroscopy

    NASA Astrophysics Data System (ADS)

    Ward, P. P.

    Plasma etching and desmear processes for printed wiring board (PWB) manufacture are difficult to predict and control. Non-uniformity of most plasma processes and sensitivity to environmental changes make it difficult to maintain process stability from day to day. To assure plasma process performance, weight loss coupons or post-plasma destructive testing must be used. These techniques are not real-time methods however, and do not allow for immediate diagnosis and process correction. These tests often require scrapping some fraction of a batch to insure the integrity of the rest. Since these tests verify a successful cycle with post-plasma diagnostics, poor test results often determine that a batch is substandard and the resulting parts unusable. These tests are a costly part of the overall fabrication cost. A more efficient method of testing would allow for constant monitoring of plasma conditions and process control. Process anomalies should be detected and corrected before the parts being treated are damaged. Real time monitoring would allow for instantaneous corrections. Multiple site monitoring would allow for process mapping within one system or simultaneous monitoring of multiple systems. Optical emission spectroscopy conducted external to the plasma apparatus would allow for this sort of multifunctional analysis without perturbing the glow discharge. In this paper, optical emission spectroscopy for non-intrusive, in situ process control will be explored along with applications of this technique to for process control, failure analysis and endpoint determination in PWB manufacture.

  9. Extraterrestrial processing and manufacturing of large space systems. Volume 3: Executive summary

    NASA Technical Reports Server (NTRS)

    Miller, R. H.; Smith, D. B. S.

    1979-01-01

    Facilities and equipment are defined for refining processes to commercial grade of lunar material that is delivered to a 'space manufacturing facility' in beneficiated, primary processed quality. The manufacturing facilities and the equipment for producing elements of large space systems from these materials and providing programmatic assessments of the concepts are also defined. In-space production processes of solar cells (by vapor deposition) and arrays, structures and joints, conduits, waveguides, RF equipment radiators, wire cables, converters, and others are described.

  10. Decontamination of chemical and biological warfare (CBW) agents using an atmospheric pressure plasma jet (APPJ)

    NASA Astrophysics Data System (ADS)

    Herrmann, H. W.; Henins, I.; Park, J.; Selwyn, G. S.

    1999-05-01

    The atmospheric pressure plasma jet (APPJ) [A. Schütze et al., IEEE Trans. Plasma Sci. 26, 1685 (1998)] is a nonthermal, high pressure, uniform glow plasma discharge that produces a high velocity effluent stream of highly reactive chemical species. The discharge operates on a feedstock gas (e.g., He/O2/H2O), which flows between an outer, grounded, cylindrical electrode and an inner, coaxial electrode powered at 13.56 MHz rf. While passing through the plasma, the feedgas becomes excited, dissociated or ionized by electron impact. Once the gas exits the discharge volume, ions and electrons are rapidly lost by recombination, but the fast-flowing effluent still contains neutral metastable species (e.g., O2*, He*) and radicals (e.g., O, OH). This reactive effluent has been shown to be an effective neutralizer of surrogates for anthrax spores and mustard blister agent. Unlike conventional wet decontamination methods, the plasma effluent does not cause corrosion and it does not destroy wiring, electronics, or most plastics, making it highly suitable for decontamination of sensitive equipment and interior spaces. Furthermore, the reactive species in the effluent rapidly degrade into harmless products leaving no lingering residue or harmful by-products.

  11. Plasma Modified Polypropylene Membranes as the Lithium-Ion Battery Separators

    NASA Astrophysics Data System (ADS)

    Wang, Zhengduo; Zhu, Huiqin; Yang, Lizhen; Wang, Xinwei; Liu, Zhongwei; Chen, Qiang

    2016-04-01

    To reduce the thermal shrinkage of the polymeric separators and improve the safety of the Li-ion batteries, plasma treatment and plasma enhanced vapor chemical deposition (PECVD) of SiOx-like are carried out on polypropylene (PP) separators, respectively. Critical parameters for separator properties, such as the thermal shrinkage rate, porosity, wettability, and mechanical strength, are evaluated on the plasma treated PP membranes. O2 plasma treatment is found to remarkably improve the wettability, porosity and electrolyte uptake. PECVD SiOx-like coatings are found to be able to effectively reduce the thermal shrinkage rate of the membranes and increase the ionic conductivity. The electrolyte-philicity of the SiOx-like coating surface can be tuned by the varying O2 content in the gas mixture during the deposition. Though still acceptable, the mechanical strength is reduced after PECVD, which is due to the plasma etching. supported by National Natural Science Foundation of China (Nos. 11175024, 11375031), the Beijing Institute of Graphic and Communication Key Project of China (No. 23190113051), the Shenzhen Science and Technology Innovation Committee of China (No. JCYJ20130329181509637), BJNSFC (No. KZ201510015014), and the State Key Laboratory of Electrical Insulation and Power Equipment of China (No. EIPE15208)

  12. Influence of oxygen in atmospheric-pressure argon plasma jet on sterilization of Bacillus atrophaeous spores

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Lim, Jin-Pyo; Uhm, Han S.; Li, Shou-Zhe

    2007-09-15

    A nonequilibrium Ar/O{sub 2} plasma discharge at atmospheric pressure was carried out in a coaxial cylindrical reactor with a stepped electrode configuration powered by a 13.56 MHz rf power supplier. The argon glow discharge with high electron density produces oxygen reactive species in large quantities. Argon plasma jets penetrate deep into ambient air and create a path for oxygen radicals to sterilize microbes. A sterilization experiment with bacterial endospores indicates that an argon-oxygen plasma jet very effectively kills endospores of Bacillus atrophaeus (ATCC 9372), thereby demonstrating its capability to clean surfaces and its usefulness for reinstating contaminated equipment as freemore » from toxic biological warfare agents. The decimal reduction time (D values) of the Ar/O{sub 2} plasma jet at an exposure distance of 0.5-1.5 cm ranges from 5 to 57 s. An actinometric comparison of the sterilization data shows that atomic oxygen radicals play a significant role in plasma sterilization. When observed under a scanning electron microscope, the average size of the spores appears to be greatly reduced due to chemical reactions with the oxygen radicals.« less

  13. Progress and prospect of true steady state operation with RF

    NASA Astrophysics Data System (ADS)

    Jacquinot, Jean

    2017-10-01

    Operation of fusion confinement experiments in full steady state is a major challenge for the development towards fusion energy. Critical to achieving this goal is the availability of actively cooled plasma facing components and auxiliary systems withstanding the very harsh plasma environment. Equally challenging are physics issues related to achieving plasma conditions and current drive efficiency required by reactor plasmas. RF heating and current drive systems have been key instruments for obtaining the progress made until today towards steady state. They hold all the records of long pulse plasma operation both in tokamaks and in stellarators. Nevertheless much progress remains to be made in particular for integrating all the requirements necessary for maintaining in steady state the density and plasma pressure conditions of a reactor. This is an important stated aim of ITER and of devices equipped with superconducting magnets. After considering the present state of the art, this review will address the key issues which remain to be solved both in physics and technology for reaching this goal. They constitute very active subjects of research which will require much dedicated experimentation in the new generation of superconducting devices which are now in operation or becoming close to it.

  14. Magnetic filter apparatus and method for generating cold plasma in semicoductor processing

    DOEpatents

    Vella, Michael C.

    1996-01-01

    Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a "cold plasma" which is diffused in the region of the process surface while the ion implantation process takes place.

  15. Magnetic filter apparatus and method for generating cold plasma in semiconductor processing

    DOEpatents

    Vella, M.C.

    1996-08-13

    Disclosed herein is a system and method for providing a plasma flood having a low electron temperature to a semiconductor target region during an ion implantation process. The plasma generator providing the plasma is coupled to a magnetic filter which allows ions and low energy electrons to pass therethrough while retaining captive the primary or high energy electrons. The ions and low energy electrons form a ``cold plasma`` which is diffused in the region of the process surface while the ion implantation process takes place. 15 figs.

  16. New insights on the propagation of pulsed atmospheric plasma streams: From single jet to multi jet arrays

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Robert, E.; Darny, T.; Dozias, S.

    2015-12-15

    Atmospheric pressure plasma propagation inside long dielectric tubes is analyzed for the first time through nonintrusive and nonperturbative time resolved bi-directional electric field (EF) measurements. This study unveils that plasma propagation occurs in a region where longitudinal EF exists ahead the ionization front position usually revealed from plasma emission with ICCD measurement. The ionization front propagation induces the sudden rise of a radial EF component. Both of these EF components have an amplitude of several kV/cm for helium or neon plasmas and are preserved almost constant along a few tens of cm inside a capillary. All these experimental measurements aremore » in excellent agreement with previous model calculations. The key roles of the voltage pulse polarity and of the target nature on the helium flow patterns when plasma jet is emerging in ambient air are documented from Schlieren visualization. The second part of this work is then dedicated to the development of multi jet systems, using two different setups, based on a single plasma source. Plasma splitting in dielectric tubes drilled with sub millimetric orifices, but also plasma transfer across metallic tubes equipped with such orifices are reported and analyzed from ICCD imaging and time resolved EF measurements. This allows for the design and the feasibility validation of plasma jet arrays but also emphasizes the necessity to account for voltage pulse polarity, target potential status, consecutive helium flow modulation, and electrostatic influence between the produced secondary jets.« less

  17. Use of Plasma Actuators as a Moving-Wake Generator

    NASA Technical Reports Server (NTRS)

    Corke, Thomas C.; Thomas, Flint O.; Klapetzky Michael J.

    2007-01-01

    The work documented in this report tests the concept of using plasma actuators as a simple and easy way to generate a simulated moving-wake and the disturbances associated with it in turbines. This wake is caused by the blades of the upstream stages of the turbine. Two types of devices, one constructed of arrays of NACA 0018 airfoils, and the one constructed of flat plates were studied. The airfoils or plates were equipped with surface mounted dielectric barrier discharge (DBD) plasma actuators, which were used to generate flow disturbances resembling moving-wakes. CTA hot-wire anemometry and flow visualization using a smoke-wire were used to investigate the wake independence at various spacings and downstream locations. The flat plates were found to produce better results than the airfoils in creating large velocity fluctuations in the free-stream flow. Different dielectric materials, plasma actuator locations, leading edge contours, angles of attack and plate spacings were investigated, some with positive results. The magnitudes of the velocity fluctuations were found to be comparable to existing mechanical moving-wake generators, thus proving the feasibility of using plasma actuators as a moving-wake generator.

  18. Studies of beam plasma interactions in a space simulation chamber using prototype Space Shuttle instruments

    NASA Technical Reports Server (NTRS)

    Banks, P. M.; Raitt, W. J.; Denig, W. F.

    1982-01-01

    In March, 1981, electron beam experiments were conducted in a large space simulation chamber using equipment destined to be flown aboard NASA's Office of Space Science-1 pallet (OSS-1). Two major flight experiments were involved. They include the Vehicle Charging and Potential (VCAP) experiment and the Plasma Diagnostics Package (PDP). Apparatus connected with VCAP included a Fast Pulse Electron Gun (FPEG), and a Charge and Current Probe (CCP). A preliminary view is provided of the results obtained when the electron emissions were held steady over relatively long periods of time such that steady state conditions could be obtained with respect to the electron beam interaction with the neutral gases and plasma of the vacuum chamber. Of particular interest was the plasma instability feature known as the Beam Plasma Discharge. For the present experiments the FPEG was used in a dc mode with a range of currents of 2 to 80 mA at a beam energy of 970 eV. Attention is given to the emissions of VLF and HF noise associated with the dc beam.

  19. Study of plasma natural convection induced by electron beam in atmosphere [

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Deng, Yongfeng, E-mail: yfdeng@mail.dlut.edu.cn; Han, Xianwei; Tan, Yonghua

    2014-06-15

    Using high-energy electron beams to ionize air is an effective way to produce a large-size plasma in the atmosphere. In particular, with a steady-state high power generator, some unique phenomena can be achieved, including natural convection of the plasma. The characteristics of this convection are studied both experimentally and numerically. The results show that an asymmetrical temperature field develops with magnitudes that vary from 295 K to 389 K at a pressure of 100 Torr. Natural convection is greatly enhanced under 760 Torr. Nevertheless, plasma transport is negligible in this convection flow field and only the plasma core tends to move upward. Parameter analysismore » is performed to discern influencing factors on this phenomenon. The beam current, reflecting the Rayleigh number Ra effect, correlates with convection intensity, which indicates that energy deposition is the underlying key factor in determining such convections. Finally, natural convection is concluded to be an intrinsic property of the electron beam when focused into dense air, and can be achieved by carefully adjusting equipment operations parameters.« less

  20. Hyperspectral imaging technique for detection of poultry fecal residues on food processing equipments

    NASA Astrophysics Data System (ADS)

    Cho, Byoung-Kwan; Kim, Moon S.; Chen, Yud-Ren

    2005-11-01

    Emerging concerns about safety and security in current mass production of food products necessitate rapid and reliable inspection for contaminant-free products. Diluted fecal residues on poultry processing plant equipment surface, not easily discernable from water by human eye, are contamination sources for poultry carcasses. Development of sensitive detection methods for fecal residues is essential to ensure safe production of poultry carcasses. Hyperspectral imaging techniques have shown good potential for detecting of the presence of fecal and other biological substances on food and processing equipment surfaces. In this study, use of high spatial resolution hyperspectral reflectance and fluorescence imaging (with UV-A excitation) is presented as a tool for selecting a few multispectral bands to detect diluted fecal and ingesta residues on materials used for manufacturing processing equipment. Reflectance and fluorescence imaging methods were compared for potential detection of a range of diluted fecal residues on the surfaces of processing plant equipment. Results showed that low concentrations of poultry feces and ingesta, diluted up to 1:100 by weight with double distilled water, could be detected using hyperspectral fluorescence images with an accuracy of 97.2%. Spectral bands determined in this study could be used for developing a real-time multispectral inspection device for detection of harmful organic residues on processing plant equipment.

  1. 40 CFR 60.276 - Recordkeeping and reporting requirements.

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ...; (4) Flow diagram of process and emission capture equipment including other equipment or process(es... values exceeding ±15 percent of the value established under § 60.274(c) or operation at flow rates lower...

  2. 40 CFR 60.276 - Recordkeeping and reporting requirements.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ...; (4) Flow diagram of process and emission capture equipment including other equipment or process(es... values exceeding ±15 percent of the value established under § 60.274(c) or operation at flow rates lower...

  3. 40 CFR 60.276 - Recordkeeping and reporting requirements.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ...; (4) Flow diagram of process and emission capture equipment including other equipment or process(es... values exceeding ±15 percent of the value established under § 60.274(c) or operation at flow rates lower...

  4. 40 CFR 60.276 - Recordkeeping and reporting requirements.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ...; (4) Flow diagram of process and emission capture equipment including other equipment or process(es... values exceeding ±15 percent of the value established under § 60.274(c) or operation at flow rates lower...

  5. 40 CFR 60.276 - Recordkeeping and reporting requirements.

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ...; (4) Flow diagram of process and emission capture equipment including other equipment or process(es... values exceeding ±15 percent of the value established under § 60.274(c) or operation at flow rates lower...

  6. Electron-Driven Processes: From Single Collision Experiments to High-Pressure Discharge Plasmas

    NASA Astrophysics Data System (ADS)

    Becker, Kurt

    2001-10-01

    Plasmas are complex systems which consist of various groups of interacting particles (neutral atoms and molecules in their ground states and in excite states, electrons, and positive and negative ions). In principle, one needs to understand and describe all interactions between these particles in order to model the properties of the plasma and to predict its behavior. However, two-body interactions are often the only processes of relevance and only a subset of all possible collisional interactions are important. The focus of this talk is on collisional and radiative processes in low-temperature plasmas, both at low and high pressures. We will limit the discussion (i) to ionization and dissociation processes in molecular low-pressure plasmas and (ii) to collisional and radiative processes in high-pressure plasmas in rare gases and mixtures of rare gases and N2, O2, and H2. Electron-impact dissociation processes can be divided into dissociative excitation and dissociation into neutral ground-state fragments. Neutral molecular dissociation has only recently received attention from experimentalists and theorists because of the serious difficulties associated with the investigation of these processes. Collisional and radiative processes in high-pressure plasmas provide a fertile environment to the study of interactions that go beyond binary collisions involving ground-state species. Step-wise processes and three-body collisions begin to dominate the behavior of such plasmas. We will discuss examples of such processes as they relate to high-pressure rare gas discharge plasmas. Work supported by NSF, DOE, DARPA, NASA, and ABA Inc.

  7. 40 CFR 98.98 - Definitions.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... this definition. (1) In situ plasma process sub-type consists of the cleaning of thin-film production... within a broad process type. For example, the chamber cleaning process type includes in-situ plasma chamber cleaning, remote plasma chamber cleaning, and in-situ thermal chamber cleaning sub-types. Process...

  8. 40 CFR 98.98 - Definitions.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... this definition. (1) In situ plasma process sub-type consists of the cleaning of thin-film production... within a broad process type. For example, the chamber cleaning process type includes in-situ plasma chamber cleaning, remote plasma chamber cleaning, and in-situ thermal chamber cleaning sub-types. Process...

  9. 40 CFR 98.98 - Definitions.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... definition. (1) In situ plasma process sub-type consists of the cleaning of thin-film production chambers... within a broad process type. For example, the chamber cleaning process type includes in-situ plasma chamber cleaning, remote plasma chamber cleaning, and in-situ thermal chamber cleaning sub-types. Process...

  10. Plasma process control with optical emission spectroscopy

    NASA Astrophysics Data System (ADS)

    Ward, P. P.

    Plasma processes for cleaning, etching and desmear of electronic components and printed wiring boards (PWB) are difficult to predict and control. Non-uniformity of most plasma processes and sensitivity to environmental changes make it difficult to maintain process stability from day to day. To assure plasma process performance, weight loss coupons or post-plasma destructive testing must be used. The problem with these techniques is that they are not real-time methods and do not allow for immediate diagnosis and process correction. These methods often require scrapping some fraction of a batch to insure the integrity of the rest. Since these methods verify a successful cycle with post-plasma diagnostics, poor test results often determine that a batch is substandard and the resulting parts unusable. Both of these methods are a costly part of the overall fabrication cost. A more efficient method of testing would allow for constant monitoring of plasma conditions and process control. Process failures should be detected before the parts being treated. are damaged. Real time monitoring would allow for instantaneous corrections. Multiple site monitoring would allow for process mapping within one system or simultaneous monitoring of multiple systems. Optical emission spectroscopy conducted external to the plasma apparatus would allow for this sort of multifunctional analysis without perturbing the glow discharge. In this paper, optical emission spectroscopy for non-intrusive, in situ process control will be explored. A discussion of this technique as it applies towards process control, failure analysis and endpoint determination will be conducted. Methods for identifying process failures, progress and end of etch back and desmear processes will be discussed.

  11. Comparison of Plasma Polymerization under Collisional and Collision-Less Pressure Regimes.

    PubMed

    Saboohi, Solmaz; Jasieniak, Marek; Coad, Bryan R; Griesser, Hans J; Short, Robert D; Michelmore, Andrew

    2015-12-10

    While plasma polymerization is used extensively to fabricate functionalized surfaces, the processes leading to plasma polymer growth are not yet completely understood. Thus, reproducing processes in different reactors has remained problematic, which hinders industrial uptake and research progress. Here we examine the crucial role pressure plays in the physical and chemical processes in the plasma phase, in interactions at surfaces in contact with the plasma phase, and how this affects the chemistry of the resulting plasma polymer films using ethanol as the gas precursor. Visual inspection of the plasma reveals a change from intense homogeneous plasma at low pressure to lower intensity bulk plasma at high pressure, but with increased intensity near the walls of the chamber. It is demonstrated that this occurs at the transition from a collision-less to a collisional plasma sheath, which in turn increases ion and energy flux to surfaces at constant RF power. Surface analysis of the resulting plasma polymer films show that increasing the pressure results in increased incorporation of oxygen and lower cross-linking, parameters which are critical to film performance. These results and insights help to explain the considerable differences in plasma polymer properties observed by different research groups using nominally similar processes.

  12. Planar controlled zone microwave plasma system

    DOEpatents

    Ripley, Edward B [Knoxville, TN; Seals, Roland D [Oak Ridge, TN; Morrell, Jonathan S [Knoxvlle, TN

    2011-10-04

    An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.

  13. Controlled zone microwave plasma system

    DOEpatents

    Ripley, Edward B [Knoxville, TN; Seals, Roland D [Oak Ridge, TN; Morrell, Jonathan S [Knoxville, TN

    2009-10-20

    An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.

  14. Monitoring non-thermal plasma processes for nanoparticle synthesis

    NASA Astrophysics Data System (ADS)

    Mangolini, Lorenzo

    2017-09-01

    Process characterization tools have played a crucial role in the investigation of dusty plasmas. The presence of dust in certain non-thermal plasma processes was first detected by laser light scattering measurements. Techniques like laser induced particle explosive evaporation and ion mass spectrometry have provided the experimental evidence necessary for the development of the theory of particle nucleation in silane-containing non-thermal plasmas. This review provides first a summary of these early efforts, and then discusses recent investigations using in situ characterization techniques to understand the interaction between nanoparticles and plasmas. The advancement of such monitoring techniques is necessary to fully develop the potential of non-thermal plasmas as unique materials synthesis and processing platforms. At the same time, the strong coupling between materials and plasma properties suggest that it is also necessary to advance techniques for the measurement of plasma properties while in presence of dust. Recent progress in this area will be discussed.

  15. Illustrated glossary of process equipment. Chinese/English/French edition

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Paruit, B.

    1984-01-01

    Here is a volume of process equipment and terms in standard Mandarin Chinese, English, and French. As with the English/French/Spanish edition, each page illustrates a particular piece of equipment, with captions identifying the key components. Glossaries at the end of each major section include the Romanized pronunciation of the Chinese.

  16. 40 CFR 61.60 - Applicability.

    Code of Federal Regulations, 2010 CFR

    2010-07-01

    ... equipment used in research and development if the reactor used to polymerize the vinyl chloride processed in the equipment has a capacity of no more than 0.19 m 3 (50 gal). (c) Sections of this subpart other... equipment used in research and development if the reactor used to polymerize the vinyl chloride processed in...

  17. Single-crystal silicon trench etching for fabrication of highly integrated circuits

    NASA Astrophysics Data System (ADS)

    Engelhardt, Manfred

    1991-03-01

    The development of single crystal silicon trench etching for fabrication of memory cells in 4 16 and 64Mbit DRAMs is reviewed in this paper. A variety of both etch tools and process gases used for the process development is discussed since both equipment and etch chemistry had to be improved and changed respectively to meet the increasing requirements for high fidelity pattern transfer with increasing degree of integration. In additon to DRAM cell structures etch results for deep trench isolation in advanced bipolar ICs and ASICs are presented for these applications grooves were etched into silicon through a highly doped buried layer and at the borderline of adjacent p- and n-well areas respectively. Shallow trench etching of large and small exposed areas with identical etch rates is presented as an approach to replace standard LOCOS isolation by an advanced isolation technique. The etch profiles were investigated with SEM TEM and AES to get information on contathination and damage levels and on the mechanism leading to anisotropy in the dry etch process. Thermal wave measurements were performed on processed single crystal silicon substrates for a fast evaluation of the process with respect to plasma-induced substrate degradation. This useful technique allows an optimization ofthe etch process regarding high electrical performance of the fully processed memory chip. The benefits of the use of magnetic fields for the development of innovative single crystal silicon dry

  18. 40 CFR 63.1020 - Definitions.

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... shall have the meaning given them in the Act and in this section. Batch process means a process in which... which the equipment is generally emptied. Examples of industries that use batch processes include pharmaceutical production and pesticide production. Batch product-process equipment train means the collection of...

  19. 40 CFR 63.1020 - Definitions.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... shall have the meaning given them in the Act and in this section. Batch process means a process in which... which the equipment is generally emptied. Examples of industries that use batch processes include pharmaceutical production and pesticide production. Batch product-process equipment train means the collection of...

  20. 40 CFR 63.1020 - Definitions.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... shall have the meaning given them in the Act and in this section. Batch process means a process in which... which the equipment is generally emptied. Examples of industries that use batch processes include pharmaceutical production and pesticide production. Batch product-process equipment train means the collection of...

  1. 40 CFR 63.1020 - Definitions.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... shall have the meaning given them in the Act and in this section. Batch process means a process in which... which the equipment is generally emptied. Examples of industries that use batch processes include pharmaceutical production and pesticide production. Batch product-process equipment train means the collection of...

  2. The expansion of a plasma into a vacuum - Basic phenomena and processes and applications to space plasma physics

    NASA Technical Reports Server (NTRS)

    Wright, K. H., Jr.; Stone, N. H.; Samir, U.

    1983-01-01

    In this review attention is called to basic phenomena and physical processes involved in the expansion of a plasma into a vacuum, or the expansion of a plasma into a more tenuous plasma, in particular the fact that upon the expansion, ions are accelerated and reach energies well above their thermal energy. Also, in the process of the expansion a rarefaction wave propagates into the ambient plasma, an ion front moves into the expansion volume, and discontinuities in plasma parameters occur. The physical processes which cause the above phenomena are discussed, and their possible application is suggested for the case of the distribution of ions and electrons (hence plasma potential and electric fields) in the wake region behind artificial and natural obstacles moving supersonically in a rarefied space plasma. To illustrate this, some in situ results are reexamined. Directions for future work in this area via the utilization of the Space Shuttle and laboratory work are also mentioned.

  3. A new linear plasma device for various edge plasma studies at SWIP

    NASA Astrophysics Data System (ADS)

    Xu, Min; Zheng, Pengfei; Tynan, George; Che, Tong; Wang, Zhanhui; Guo, Dong; Wei, Ran

    2017-10-01

    To facilitate the plasma-material interactions (PMI) studies, Southwestern Institute of Physics (SWIP) has constructed a linear plasma device. It is comprised of a source chamber (Φ 0.4 m), a target chamber (Φ 0.9 m), 15 magnets with different sizes, and power supplies with the total power of a few hundred kilowatts, etc. A maximum magnetic field of 0.3 Tesla along the axial direction can be produced. The current of each of the 15 magnets can be independently controlled. More than 60 ports are available for diagnostics, with the sizes vary from Φ 50 mm to Φ 150 mm. Rectangular ports of 190 mm × 270 mm are also available. 12 ports looking at the sample holder are specially designed for ion beam injection, of which the axes are 25 to the chamber axis. The device is equipped with a LaB6 hot cathode plasma source, which is able to generate steady-state H/D/He plasmas with a diameter of Φ 100 mm, density of 1x1019 /m3 , and a particle flux of 1022 1023 n/m2 .s. The electron temperature is usually a few eV. Further, a Helicon RF plasma source is also planned for plasma transport studies. Int'l Sci & Tech Cooperation Program of China (No. 2015DFA61760).

  4. Study of ND3-enhanced MAR processes in D2-N2 plasmas to induce plasma detachment

    NASA Astrophysics Data System (ADS)

    Abe, Shota; Chakraborty Thakur, Saikat; Doerner, Russ; Tynan, George

    2017-10-01

    The Molecular Assisted Recombination (MAR) process is thought to be a main channel of volumetric recombination to induce the plasma detachment operation. Authors have focused on a new plasma recombination process supported by ammonia molecules, which will be formed by impurity seeding of N2 for controlling divertor plasma temperature and heat loads in ITER. This ammonia-enhanced MAR process would occur throughout two steps. In this study, the first step of the new MAR process is investigated in low density plasmas (Ne 1016 m-3, Te 4 eV) fueled by D2 and N2. Ion and neutral densities are measured by a calibrated Electrostatic Quadrupole Plasma (EQP) analyzer, combination of an ion energy analyzer and mass spectrometer. The EQP shows formation of ND3 during discharges. Ion densities calculated by a rate equation model are compared with experimental results. We find that the model can reproduce the observed ion densities in the plasma. The model calculation shows that the dominant neutralization channel of Dx+(x =1-3) ions in the volume is the formation of NDy+(y =3 or 4) throughout charge/D+ exchange reactions with ND3. Furthermore, high density plasmas (Ne 1016 m-3) have been achieved to investigate electron-impact dissociative recombination processes of formed NDy+,which is the second step of this MAR process.

  5. UOE Pipe Manufacturing Process Simulation: Equipment Designing and Construction

    NASA Astrophysics Data System (ADS)

    Delistoian, Dmitri; Chirchor, Mihael

    2017-12-01

    UOE pipe manufacturing process influence directly on pipeline resilience and operation capacity. At present most spreaded pipe manufacturing method is UOE. This method is based on cold forming. After each technological step appears a certain stress and strain level. For pipe stress strain study is designed and constructed special equipment that simulate entire technological process.UOE pipe equipment is dedicated for manufacturing of longitudinally submerged arc welded DN 400 (16 inch) steel pipe.

  6. The Basic Plasma Science Facility: a platform for studying plasma processes relevant to space and astrophysical settings

    NASA Astrophysics Data System (ADS)

    Carter, T. A.

    2017-10-01

    The Basic Plasma Science Facility at UCLA is a national user facility for studies of fundamental processes in magnetized plasmas. The centerpiece is the Large Plasma Device, a 20 m, magnetized linear plasma device. Two hot cathode plasma sources are available. A Barium Oxide coated cathode produces plasmas with n 1012 cm-3, Te 5 eV, Ti < 1 eV with magnetic field from 400G-2kG. This low- β plasma has been used to study fundamental processes, including: dispersion and damping of kinetic and inertial Alfvén waves, flux ropes and magnetic reconnection, three-wave interactions and parametric instabilities of Alfvén waves, turbulence and transport, and interactions of energetic ions and electrons with plasma waves. A new Lanthanum Hexaboride (LaB6) cathode is now available which produces significantly higher densities and temperatures: n < 5 ×1013 cm-3, Te 12 eV, Ti 6 eV. This higher pressure plasma source enabled the observation of laser-driven collisionless magnetized shocks and, with lowered magnetic field, provides magnetized plasmas with β approaching or possibly exceeding unity. This opens up opportunities for investigating processes relevant to the solar wind and astrophysical plasmas. BaPSF is jointly supported by US DOE and NSF.

  7. DOE Office of Scientific and Technical Information (OSTI.GOV)

    Slabodchikov, Vladimir A., E-mail: dipis1991@mail.ru; Borisov, Dmitry P., E-mail: borengin@mail.ru; Kuznetsov, Vladimir M., E-mail: kuznetsov@rec.tsu.ru

    The paper reports on a new method of plasma immersion ion implantation for the surface modification of medical materials using the example of nickel-titanium (NiTi) alloys much used for manufacturing medical implants. The chemical composition and surface properties of NiTi alloys doped with silicon by conventional ion implantation and by the proposed plasma immersion method are compared. It is shown that the new plasma immersion method is more efficient than conventional ion beam treatment and provides Si implantation into NiTi surface layers through a depth of a hundred nanometers at low bias voltages (400 V) and temperatures (≤150°C) of the substrate.more » The research results suggest that the chemical composition and surface properties of materials required for medicine, e.g., NiTi alloys, can be successfully attained through modification by the proposed method of plasma immersion ion implantation and by other methods based on the proposed vacuum equipment without using any conventional ion beam treatment.« less

  8. The real time multi point Thomson scattering diagnostic at NSTX-U

    NASA Astrophysics Data System (ADS)

    Laggner, Florian; Kolemen, Egemen; Diallo, Ahmed; Leblanc, Benoit; Rozenblat, Roman; Tchilinguirian, Greg; NSTX-U Team Team

    2017-10-01

    This contribution presents the upgrade of the multi point Thomson scattering (MPTS) diagnostic for real time application. As a key diagnostic at NSTX-U, the MPTS diagnostic simultaneously measures the electron density (ne) and electron temperature (Te) profiles of a plasma discharge. Therefore, this powerful diagnostic can directly access the electron pressure of the plasma. Currently, only post-discharge evaluation of the data is available, however, since the plasma pressure is one important drive for instabilities, real time measurements of this quantities would be beneficial for plasma control. In a first step, ten MPTS channels were equipped with real time electronics, which improve the data acquisition rate by five orders of magnitude. The commissioning of the system is ongoing and first benchmarks of the real time evaluation routines against the standard, post-discharge evaluation show promising results: The Te as well as ne profiles of both types of analyses agree within their uncertainties. This work was supported by the US Department of Energy under DE-SC0015878 and DE-SC0015480.

  9. Gasoline from coal in the state of Illinois: feasibility study. Volume I. Design. [KBW gasification process, ICI low-pressure methanol process and Mobil M-gasoline process

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Not Available

    1980-01-01

    Volume 1 describes the proposed plant: KBW gasification process, ICI low-pressure methanol process and Mobil M-gasoline process, and also with ancillary processes, such as oxygen plant, shift process, RECTISOL purification process, sulfur recovery equipment and pollution control equipment. Numerous engineering diagrams are included. (LTN)

  10. Inductive plasmas for plasma processing

    NASA Astrophysics Data System (ADS)

    Keller, John H.

    1996-05-01

    With the need for high plasma density and low pressure in single wafer etching tools, a number of inductive etching systems have been and are being developed for commercial sale. This paper reviews some of the history of low-pressure inductive plasmas, gives features of inductive plasmas, limitations, corrections and presents uses for plasma processing. The theory for the skin depth, rf coil impedance and efficiency is also discussed.

  11. Characterization of plasma processing induced charging damage to MOS devices

    NASA Astrophysics Data System (ADS)

    Ma, Shawming

    1997-12-01

    Plasma processing has become an integral part of the fabrication of integrated circuits and takes at least 30% of whole process steps since it offers advantages in terms of directionality, low temperature and process convenience. However, wafer charging during plasma processes is a significant concern for both thin oxide damage and profile distortion. In this work, the factors affecting this damage will be explained by plasma issues, device structure and oxide quality. The SPORT (Stanford Plasma On-wafer Real Time) charging probe was developed to investigate the charging mechanism of different plasma processes including poly-Si etching, resist ashing and PECVD. The basic idea of this probe is that it simulates a real device structure in the plasma environment and allows measurement of plasma induced charging voltages and currents directly in real time. This measurement is fully compatible with other charging voltage measurement but it is the only one to do in real-time. Effect of magnetic field induced plasma nonuniformity on spatial dependent charging is well understood by this measurement. In addition, the plasma parameters including ion current density and electron temperature can also be extracted from the probe's plasma I-V characteristics using a dc Langmuir probe like theory. It will be shown that the MOS device tunneling current from charging, the dependence on antenna ratio and the etch uniformity can all be predicted by using this measurement. Moreover, the real-time measurement reveals transient and electrode edge effect during processing. Furthermore, high aspect ratio pattern induced electron shading effects can also be characterized by the probe. On the oxide quality issue, wafer temperature during plasma processing has been experimentally shown to be critical to charging damage. Finally, different MOS capacitor testing methods including breakdown voltage, charge-to-breakdown, gate leakage current and voltage-time at constant current bias were compared to find the optimum method for charging device reliability testing.

  12. 48 CFR 1513.507 - Clauses.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... automatic data processing equipment, word processing, and similar types of commercially available equipment... CONTRACT TYPES SIMPLIFIED ACQUISITION PROCEDURES Purchase Orders 1513.507 Clauses. (a) It is the general...

  13. ELF waves and ion resonances produced by an electron beam emitting rocket in the ionosphere

    NASA Technical Reports Server (NTRS)

    Winckler, J. R.; Abe, Y.; Erickson, K. N.

    1986-01-01

    Results are reported from the ECHO-6 electron-beam-injection experiment, performed in the auroral-zone ionosphere on March 30, 1983 using a sounding rocket equipped with two electron guns and a free-flying plasma-diagnostics instrument package. The data are presented in extensive graphs and diagrams and characterized in detail. Large ELF wave variations, superposed on the strong beam-sector-directed quasi-dc component, are observed in the 100-eV beam-induced plasma when the beam is injected in a transverse spiral, but not when it is injected upward parallel to the magnetic-field line. ELF activity is found to be suppressed whenever the rocket passed through field lines with auroral activity, suggesting that the waves are produced by the interaction of the beam potentials, plasma currents, and return currents neutralizing the accelerator payload.

  14. Plasma Processing of Model Residential Solid Waste

    NASA Astrophysics Data System (ADS)

    Messerle, V. E.; Mossé, A. L.; Nikonchuk, A. N.; Ustimenko, A. B.; Baimuldin, R. V.

    2017-09-01

    The authors have tested the technology of processing of model residential solid waste. They have developed and created a pilot plasma unit based on a plasma chamber incinerator. The waste processing technology has been tested and prepared for commercialization.

  15. The line roughness improvement with plasma coating and cure treatment for 193nm lithography and beyond

    NASA Astrophysics Data System (ADS)

    Zheng, Erhu; Huang, Yi; Zhang, Haiyang

    2017-03-01

    As CMOS technology reaches 14nm node and beyond, one of the key challenges of the extension of 193nm immersion lithography is how to control the line edge and width roughness (LER/LWR). For Self-aligned Multiple Patterning (SaMP), LER becomes larger while LWR becomes smaller as the process proceeds[1]. It means plasma etch process becomes more and more dominant for LER reduction. In this work, we mainly focus on the core etch solution including an extra plasma coating process introduced before the bottom anti reflective coating (BARC) open step, and an extra plasma cure process applied right after BARC-open step. Firstly, we leveraged the optimal design experiment (ODE) to investigate the impact of plasma coating step on LER and identified the optimal condition. ODE is an appropriate method for the screening experiments of non-linear parameters in dynamic process models, especially for high-cost-intensive industry [2]. Finally, we obtained the proper plasma coating treatment condition that has been proven to achieve 32% LER improvement compared with standard process. Furthermore, the plasma cure scheme has been also optimized with ODE method to cover the LWR degradation induced by plasma coating treatment.

  16. Plasma characterization studies for materials processing

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Pfender, E.; Heberlein, J.

    New applications for plasma processing of materials require a more detailed understanding of the fundamental processes occurring in the processing reactors. We have developed reactors offering specific advantages for materials processing, and we are using modeling and diagnostic techniques for the characterization of these reactors. The emphasis is in part set by the interest shown by industry pursuing specific plasma processing applications. In this paper we report on the modeling of radio frequency plasma reactors for use in materials synthesis, and on the characterization of the high rate diamond deposition process using liquid precursors. In the radio frequency plasma torchmore » model, the influence of specific design changes such as the location of the excitation coil on the enthalpy flow distribution is investigated for oxygen and air as plasma gases. The diamond deposition with liquid precursors has identified the efficient mass transport in form of liquid droplets into the boundary layer as responsible for high growth, and the chemical properties of the liquid for the film morphology.« less

  17. Plasma treatment effect on angiogenesis in wound healing process evaluated in vivo using angiographic optical coherence tomography

    NASA Astrophysics Data System (ADS)

    Kim, D. W.; Park, T. J.; Jang, S. J.; You, S. J.; Oh, W. Y.

    2016-12-01

    Non-thermal atmospheric pressure plasma holds promise for promoting wound healing. However, plasma-induced angiogenesis, which is important to better understand the underlying physics of plasma treatment effect on wound healing, remains largely unknown. We therefore evaluated the effect of non-thermal plasma on angiogenesis during wound healing through longitudinal monitoring over 30 days using non-invasive angiographic optical coherence tomography imaging in vivo. We demonstrate that the plasma-treated vascular wound area of mouse ear was noticeably decreased as compared to that of control during the early days in the wound healing process. We also observed that the vascular area density was increased in the plasma affected region near the wound as compared to the plasma unaffected region. The difference in the vascular wound area and the vascular area density peaked around day 3. This indicates that the plasma treatment induced additional angiogenic effects in the wound healing process especially during the early days. This non-invasive optical angiographic approach for in vivo time-lapse imaging provides further insights into elucidating plasma-induced angiogenesis in the wound healing process and its application in the biomedical plasma evaluation.

  18. Preparation Of Sources For Plasma Vapor Deposition

    NASA Technical Reports Server (NTRS)

    Waters, William J.; Sliney, Hal; Kowalski, D.

    1993-01-01

    Multicomponent metal targets serving as sources of vapor for plasma vapor deposition made in modified pressureless-sintering process. By use of targets made in modified process, one coats components with materials previously plasma-sprayed or sintered but not plasma-vapor-deposited.

  19. Fabrication of 0.25-um electrode width SAW filters using x-ray lithography with a laser plasma source

    NASA Astrophysics Data System (ADS)

    Bobkowski, Romuald; Li, Yunlei; Fedosejevs, Robert; Broughton, James N.

    1996-05-01

    A process for the fabrication of surface acoustic wave (SAW) devices with line widths of 250 nm and less, based on x-ray lithography using a laser-plasma source has been developed. The x-ray lithography process is based on keV x-ray emission from Cu plasma produced by 15 Hz, 50 ps, 248 nm KrF excimer laser pulses. The full structure of a 2 GHz surface acoustic wave filter with interdigital transducers in a split-electrode geometry has been manufactured. The devices require patterning a 150 nm thick aluminum layer on a LiNbO3 substrate with electrodes 250 nm wide. The manufacturing process has two main steps: x-ray mask fabrication employing e-beam lithography and x-ray lithography to obtain the final device. The x-ray masks are fabricated on 1 micrometers thick membranes of Si2N4. The line patterns on the masks are written into PMMA resist using a scanning electron microscope which has been interfaced to a personal computer equipped to control the x and y scan voltages. The opaque regions of the x-ray mask are then formed by electroplating fine grain gold into the open spaces in the etched PMMA. The mask and sample are mounted in an exposure cassette with a fixed spacer of 10 micrometers separating them. The sample consists of a LiNbO3 substrate coated with Shipley XP90104C x-ray resist which has been previously characterized. The x-ray patterning is carried out in an exposure chamber with flowing helium background gas in order to minimize debris deposition on the filters. After etching the x-ray resist, the final patterns are produced using metallization and a standard lift-off technique. The SAW filters are then bonded and packaged onto impedance matching striplines. The resultant devices are tested using Scalar Network Analyzers. The final devices produced had a center frequency of 1.93 GHz with a bandwidth of 98 MHz, close to the expected performance of our simple design.

  20. A review on plasma-etch-process induced damage of HgCdTe

    NASA Astrophysics Data System (ADS)

    Liu, Lingfeng; Chen, Yiyu; Ye, Zhenhua; Ding, Ruijun

    2018-05-01

    Dry etching techniques with minimal etch induced damage are required to develop highly anisotropic etch for pixel delineation of HgCdTe infrared focal plane arrays (IRFPAs). High density plasma process has become the main etching technique for HgCdTe in the past twenty years, In this paper, high density plasma electron cyclotron resonance (ECR) and inductively coupled plasma (ICP) etching of HgCdTe are summarized. Common plasma-etch-process induced type conversion and related mechanisms are reviewed particularly.

  1. Studies of RF sheaths and diagnostics on IShTAR

    NASA Astrophysics Data System (ADS)

    Crombé, K.; Devaux, S.; D'Inca, R.; Faudot, E.; Faugel, H.; Fünfgelder, H.; Heuraux, S.; Jacquot, J.; Louche, F.; Moritz, J.; Ochoukov, R.; Tripsky, M.; Van Eester, D.; Wauters, T.; Noterdaeme, J.-M.

    2015-12-01

    IShTAR (Ion cyclotron Sheath Test ARrangement) is a linear magnetised plasma test facility for RF sheaths studies at the Max-Planck-Institut für Plasmaphysik in Garching. In contrast to a tokamak, a test stand provides more liberty to impose the parameters and gives better access for the instrumentation and antennas. The project will support the development of diagnostic methods for characterising RF sheaths and validate and improve theoretical predictions. The cylindrical vacuum vessel has a diameter of 1 m and is 1.1 m long. The plasma is created by an external cylindrical plasma source equipped with a helical antenna that has been designed to excite the m=1 helicon mode. In inductive mode, plasma densities and electron temperatures have been characterised with a planar Langmuir probe as a function of gas pressure and input RF power. A 2D array of RF compensated Langmuir probes and a spectrometer are planned. A single strap RF antenna has been designed; the plasma-facing surface is aligned to the cylindrical plasma to ease the modelling. The probes will allow direct measurements of plasma density profiles in front of the RF antenna, and thus a detailed study of the density modifications induced by RF sheaths, which influences the coupling. The RF antenna frequency has been chosen to study different plasma wave interactions: the accessible plasma density range includes an evanescent and propagative behaviour of slow or fast waves, and allows the study of the effect of the lower hybrid resonance layer.

  2. Identification of new intrinsic proteins in Arabidopsis plasma membrane proteome.

    PubMed

    Marmagne, Anne; Rouet, Marie-Aude; Ferro, Myriam; Rolland, Norbert; Alcon, Carine; Joyard, Jacques; Garin, Jérome; Barbier-Brygoo, Hélène; Ephritikhine, Geneviève

    2004-07-01

    Identification and characterization of anion channel genes in plants represent a goal for a better understanding of their central role in cell signaling, osmoregulation, nutrition, and metabolism. Though channel activities have been well characterized in plasma membrane by electrophysiology, the corresponding molecular entities are little documented. Indeed, the hydrophobic protein equipment of plant plasma membrane still remains largely unknown, though several proteomic approaches have been reported. To identify new putative transport systems, we developed a new proteomic strategy based on mass spectrometry analyses of a plasma membrane fraction enriched in hydrophobic proteins. We produced from Arabidopsis cell suspensions a highly purified plasma membrane fraction and characterized it in detail by immunological and enzymatic tests. Using complementary methods for the extraction of hydrophobic proteins and mass spectrometry analyses on mono-dimensional gels, about 100 proteins have been identified, 95% of which had never been found in previous proteomic studies. The inventory of the plasma membrane proteome generated by this approach contains numerous plasma membrane integral proteins, one-third displaying at least four transmembrane segments. The plasma membrane localization was confirmed for several proteins, therefore validating such proteomic strategy. An in silico analysis shows a correlation between the putative functions of the identified proteins and the expected roles for plasma membrane in transport, signaling, cellular traffic, and metabolism. This analysis also reveals 10 proteins that display structural properties compatible with transport functions and will constitute interesting targets for further functional studies.

  3. Plasma metallurgical production of nanocrystalline borides and carbides

    NASA Astrophysics Data System (ADS)

    Galevsky, G. V.; Rudneva, V. V.; Cherepanov, A. N.; Galevsky, S. G.; Efimova, K. A.

    2016-09-01

    he experience in production and study of properties of nanocrystalline borides and chromium carbides, titanium, silicon was summarized. The design and features of the vertical three-jet once-through reactor with power 150 kW, used in the plasma metallurgical production, was described. The technological, thermotechnical and resource characteristics of the reactor were identified. The parameters of borides and carbides synthesis, their main characteristics in the nanodispersed state and equipment-technological scheme of production were provided. Evaluation of engineering-and-economical performance of the laboratory and industrial levels of borides and carbides production and the state corresponding to the segment of the world market was carried out.

  4. Towards Plasma-Based Water Purification: Challenges and Prospects for the Future

    NASA Astrophysics Data System (ADS)

    Foster, John

    2016-10-01

    Freshwater scarcity derived from climate change, pollution, and over-development has led to serious consideration for water reuse. Advanced water treatment technologies will be required to process wastewater slated for reuse. One new and emerging technology that could potentially address the removal micropollutants in both drinking water as well as wastewater slated for reuse is plasma-based water purification. Plasma in contact with liquid water generates reactive species that attack and ultimately mineralize organic contaminants in solution. This interaction takes place in a boundary layer centered at the plasma-liquid interface. An understanding of the physical processes taking place at this interface, though poorly understood, is key to the optimization of plasma water purifiers. High electric field conditions, large density gradients, plasma-driven chemistries, and fluid dynamic effects prevail in this multiphase region. The region is also the source function for longer-lived reactive species that ultimately treat the water. Here, we review the need for advanced water treatment methods and in the process, make the case for plasma-based methods. Additionally, we survey the basic methods of interacting plasma with liquid water (including a discussion of breakdown processes in water), the current state of understanding of the physical processes taking place at the plasma-liquid interface, and the role that these processes play in water purification. The development of diagnostics usable in this multiphase environment along modeling efforts aimed at elucidating physical processes taking place at the interface are also detailed. Key experiments that demonstrate the capability of plasma-based water treatment are also reviewed. The technical challenges to the implementation of plasma-based water reactors are also discussed. NSF CBET 1336375 and DOE DE-SC0001939.

  5. Review of microscopic plasma processes of occurring during refilling of the plasmasphere

    NASA Technical Reports Server (NTRS)

    Singh, N.; Torr, D. G.

    1988-01-01

    Refilling of the plasmashere after geomagnetic storms involves both macroscopic and microscopic plasma processes. The latter types of processes facilitate the refilling by trapping the plasma in the flux tube and by thermalizing the interhemispheric flow. A review of studies on microscopic processes is presented. The primary focus in this review is on the processes when the density is low and the plasma is collisionless. The discussion includes electrostatic shock formation, pitch angle scatterring extended ion heating and localized ion heating in the equatorial region.

  6. Method to Improve Indium Bump Bonding via Indium Oxide Removal Using a Multi-Step Plasma Process

    NASA Technical Reports Server (NTRS)

    Dickie, Matthew R. (Inventor); Nikzad, Shouleh (Inventor); Greer, H. Frank (Inventor); Jones, Todd J. (Inventor); Vasquez, Richard P. (Inventor); Hoenk, Michael E. (Inventor)

    2012-01-01

    A process for removing indium oxide from indium bumps in a flip-chip structure to reduce contact resistance, by a multi-step plasma treatment. A first plasma treatment of the indium bumps with an argon, methane and hydrogen plasma reduces indium oxide, and a second plasma treatment with an argon and hydrogen plasma removes residual organics. The multi-step plasma process for removing indium oxide from the indium bumps is more effective in reducing the oxide, and yet does not require the use of halogens, does not change the bump morphology, does not attack the bond pad material or under-bump metallization layers, and creates no new mechanisms for open circuits.

  7. Real-Time Data Streaming and Storing Structure for the LHD's Fusion Plasma Experiments

    NASA Astrophysics Data System (ADS)

    Nakanishi, Hideya; Ohsuna, Masaki; Kojima, Mamoru; Imazu, Setsuo; Nonomura, Miki; Emoto, Masahiko; Yoshida, Masanobu; Iwata, Chie; Ida, Katsumi

    2016-02-01

    The LHD data acquisition and archiving system, i.e., LABCOM system, has been fully equipped with high-speed real-time acquisition, streaming, and storage capabilities. To deal with more than 100 MB/s continuously generated data at each data acquisition (DAQ) node, DAQ tasks have been implemented as multitasking and multithreaded ones in which the shared memory plays the most important role for inter-process fast and massive data handling. By introducing a 10-second time chunk named “subshot,” endless data streams can be stored into a consecutive series of fixed length data blocks so that they will soon become readable by other processes even while the write process is continuing. Real-time device and environmental monitoring are also implemented in the same way with further sparse resampling. The central data storage has been separated into two layers to be capable of receiving multiple 100 MB/s inflows in parallel. For the frontend layer, high-speed SSD arrays are used as the GlusterFS distributed filesystem which can provide max. 2 GB/s throughput. Those design optimizations would be informative for implementing the next-generation data archiving system in big physics, such as ITER.

  8. Making equipment to process paddy water for providing drinking water by using Ozone-UVC& Ultrafiltration

    NASA Astrophysics Data System (ADS)

    Styani, E.; Dja'var, N.; Irawan, C.; Hanafi

    2018-01-01

    This study focuses on making equipment which is useful to process paddy water to be consumable as drinking water by using ozone-UVC and ultrafiltration. The equipment which is made by the process of ozone-UVC and ultrafiltration or reverse osmosis is driven by electric power generated from solar panels. In the experiment, reverse osmosis system with ozone-UVC reactor proves to be good enough in producing high quality drinking water.

  9. 78 FR 25916 - Authorization of Radiofrequency Equipment

    Federal Register 2010, 2011, 2012, 2013, 2014

    2013-05-03

    ...] Authorization of Radiofrequency Equipment AGENCY: Federal Communications Commission. ACTION: Proposed rule. SUMMARY: This document proposes certain changes to the Commission's equipment authorization processes to... TCBs in certifying RF equipment and post-market surveillance, as well as the Commission's role in...

  10. 40 CFR 63.140 - Process wastewater provisions-delay of repair.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... 40 Protection of Environment 10 2014-07-01 2014-07-01 false Process wastewater provisions-delay of... Manufacturing Industry for Process Vents, Storage Vessels, Transfer Operations, and Wastewater § 63.140 Process wastewater provisions—delay of repair. (a) Delay of repair of equipment for which a control equipment failure...

  11. 40 CFR 63.140 - Process wastewater provisions-delay of repair.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... 40 Protection of Environment 10 2012-07-01 2012-07-01 false Process wastewater provisions-delay of... Manufacturing Industry for Process Vents, Storage Vessels, Transfer Operations, and Wastewater § 63.140 Process wastewater provisions—delay of repair. (a) Delay of repair of equipment for which a control equipment failure...

  12. 40 CFR 63.140 - Process wastewater provisions-delay of repair.

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... 40 Protection of Environment 9 2011-07-01 2011-07-01 false Process wastewater provisions-delay of... Manufacturing Industry for Process Vents, Storage Vessels, Transfer Operations, and Wastewater § 63.140 Process wastewater provisions—delay of repair. (a) Delay of repair of equipment for which a control equipment failure...

  13. 40 CFR 63.140 - Process wastewater provisions-delay of repair.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... 40 Protection of Environment 10 2013-07-01 2013-07-01 false Process wastewater provisions-delay of... Manufacturing Industry for Process Vents, Storage Vessels, Transfer Operations, and Wastewater § 63.140 Process wastewater provisions—delay of repair. (a) Delay of repair of equipment for which a control equipment failure...

  14. Two-Step Plasma Process for Cleaning Indium Bonding Bumps

    NASA Technical Reports Server (NTRS)

    Greer, Harold F.; Vasquez, Richard P.; Jones, Todd J.; Hoenk, Michael E.; Dickie, Matthew R.; Nikzad, Shouleh

    2009-01-01

    A two-step plasma process has been developed as a means of removing surface oxide layers from indium bumps used in flip-chip hybridization (bump bonding) of integrated circuits. The two-step plasma process makes it possible to remove surface indium oxide, without incurring the adverse effects of the acid etching process.

  15. Laser Diagnostic Method for Plasma Sheath Potential Mapping

    NASA Astrophysics Data System (ADS)

    Walsh, Sean P.

    Electric propulsion systems are gaining popularity in the aerospace field as a viable option for long term positioning and thrusting applications. In particular, Hall thrusters have shown promise as the primary propulsion engine for space probes during interplanetary journeys. However, the interaction between propellant xenon ions and the ceramic channel wall continues to remain a complex issue. The most significant source of power loss in Hall thrusters is due to electron and ion currents through the sheath to the channel wall. A sheath is a region of high electric field that separates a plasma from a wall or surface in contact. Plasma electrons with enough energy to penetrate the sheath may result emission of a secondary electron from the wall. With significant secondary electron emission (SEE), the sheath voltage is reduced and so too is the electron retarding electric field. Therefore, a lower sheath voltage further increases the particle loss to the wall of a Hall thruster and leads to plasma cooling and lower efficiency. To further understand sheath dynamics, laser-induced fluorescence is employed to provide a non-invasive, in situ, and spatially resolved technique for measuring xenon ion velocity. By scanning the laser wavelength over an electronic transition of singly ionized xenon and collecting the resulting fluorescence, one can determine the ion velocity from the Doppler shifted absorption. Knowing the velocity at multiple points in the sheath, it can be converted to a relative electric potential profile which can reveal a lot about the plasma-wall interaction and the severity of SEE. The challenge of adequately measuring sheath potential profiles is optimizing the experiment to maximize the signal-to-noise ratio. A strong signal with low noise, enables high resolution measurements and increases the depth of measurement in the sheath, where the signal strength is lowest. Many improvements were made to reduce the background luminosity, increase the fluorescence intensity and collection efficiency, and optimize the signal processing equipment. Doing so has allowed for a spatial resolution of 60 microns and a maximum depth of measurement of 2 mm depending on conditions. Sheaths surrounding common Hall thruster ceramics at various plasma conditions were measured in an attempt to determine the effect of SEE and a numerical analysis of the plasma-wall interactions was conducted to further understand the phenomena and compare against obtained data.

  16. DOE Office of Scientific and Technical Information (OSTI.GOV)

    Riss P. J.; Fowler J.; Riss, P.J.

    N-(4-fluorobut-2-yn-1-yl)-2{beta}-carbomethoxy-3{beta}-(4{prime}-tolyl)nortropane (PR04.MZ, 1) is a PET radioligand for the non-invasive exploration of the function of the cerebral dopamine transporter (DAT). A reliable automated process for routine production of the carbon-11 labelled analogue [{sup 11}C]PR04.MZ ([{sup 11}C]-1) has been developed using GMP compliant equipment. An adult female Papioanubis baboon was studied using a test-retest protocol with [{sup 11}C]-1 in order to assess test-retest reliability, metabolism and CNS distribution profile of the tracer in non-human primates. Blood sampling was performed throughout the studies for determination of the free fraction in plasma (fP), plasma input functions and metabolic degradation of the radiotracer [{supmore » 11}C]-1. Time-activity curves were derived for the putamen, the caudate nucleus, the ventral striatum, the midbrain and the cerebellum. Distribution volumes (VT) and non-displaceable binding potentials (BPND) for various brain regions and the blood were obtained from kinetic modelling. [{sup 11}C]-1 shows promising results as aselective marker of the presynaptic dopamine transporter. With the reliable visualisation of the extra-striatal dopaminergic neurons and no indication on labelled metabolites, the tracer provides excellent potential for translation into man.« less

  17. A decontamination study of simulated chemical and biological agents

    NASA Astrophysics Data System (ADS)

    Uhm, Han S.; Lee, Han Y.; Hong, Yong C.; Shin, Dong H.; Park, Yun H.; Hong, Yi F.; Lee, Chong K.

    2007-07-01

    A comprehensive decontamination scheme of the chemical and biological agents, including airborne agents and surface contaminating agents, is presented. When a chemical and biological attack occurs, it is critical to decontaminate facilities or equipments to an acceptable level in a very short time. The plasma flame presented here may provide a rapid and effective elimination of toxic substances in the interior air in isolated spaces. As an example, a reaction chamber, with the dimensions of a 22cm diameter and 30cm length, purifies air with an airflow rate of 5000l/min contaminated with toluene, the simulated chemical agent, and soot from a diesel engine, the simulated aerosol for biological agents. Although the airborne agents in an isolated space are eliminated to an acceptable level by the plasma flame, the decontamination of the chemical and biological agents cannot be completed without cleaning surfaces of the facilities. A simulated sterilization study of micro-organisms was carried out using the electrolyzed ozone water. The electrolyzed ozone water very effectively kills endospores of Bacillus atrophaeus (ATCC 9372) within 3min. The electrolyzed ozone water also kills the vegetative micro-organisms, fungi, and virus. The electrolyzed ozone water, after the decontamination process, disintegrates into ordinary water and oxygen without any trace of harmful materials to the environment.

  18. Simultaneous desulfurization and denitrification of flue gas by ·OH radicals produced from O2+ and water vapor in a duct.

    PubMed

    Bai, Mindi; Zhang, Zhitao; Bai, Mindong

    2012-09-18

    In the present study, simultaneous flue gas desulfurization and denitrification are achieved with ·OH radicals generated from O(2)(+) reacting with water vapor in a duct. The O(2)(+) ions are generated by a strong ionization dielectric barrier discharge and then injected into the duct. Compared with conventional gas discharge treatment, the present method does not need a plasma reaction reactor, additional catalysts, reductants, or oxidants. The main recovered products are the liquids H(2)SO(4) and HNO(3), which can be used in many processes. Removal rates of 97% for NO and 82% for SO(2) are obtained under the following optimal experimental conditions: molar ratio of reactive oxygen species (O(2)(+), O(3)) to SO(2) and NO, 5; inlet flue gas temperature, 65 °C; reaction time, 0.94 s; and H(2)O volume fraction, 8%. Production of O(2)(+) and the plasma reaction mechanisms are discussed, and the recovered acid is characterized. The experimental results show that the present method performs better for denitrification than for desulfurization. Compared with conventional air discharge flue gas treatments, the present method has lower initial investment and operating costs, and the equipment is more compact.

  19. A simple method for plasma total vitamin C analysis suitable for routine clinical laboratory use.

    PubMed

    Robitaille, Line; Hoffer, L John

    2016-04-21

    In-hospital hypovitaminosis C is highly prevalent but almost completely unrecognized. Medical awareness of this potentially important disorder is hindered by the inability of most hospital laboratories to determine plasma vitamin C concentrations. The availability of a simple, reliable method for analyzing plasma vitamin C could increase opportunities for routine plasma vitamin C analysis in clinical medicine. Plasma vitamin C can be analyzed by high performance liquid chromatography (HPLC) with electrochemical (EC) or ultraviolet (UV) light detection. We modified existing UV-HPLC methods for plasma total vitamin C analysis (the sum of ascorbic and dehydroascorbic acid) to develop a simple, constant-low-pH sample reduction procedure followed by isocratic reverse-phase HPLC separation using a purely aqueous low-pH non-buffered mobile phase. Although EC-HPLC is widely recommended over UV-HPLC for plasma total vitamin C analysis, the two methods have never been directly compared. We formally compared the simplified UV-HPLC method with EC-HPLC in 80 consecutive clinical samples. The simplified UV-HPLC method was less expensive, easier to set up, required fewer reagents and no pH adjustments, and demonstrated greater sample stability than many existing methods for plasma vitamin C analysis. When compared with the gold-standard EC-HPLC method in 80 consecutive clinical samples exhibiting a wide range of plasma vitamin C concentrations, it performed equivalently. The easy set up, simplicity and sensitivity of the plasma vitamin C analysis method described here could make it practical in a normally equipped hospital laboratory. Unlike any prior UV-HPLC method for plasma total vitamin C analysis, it was rigorously compared with the gold-standard EC-HPLC method and performed equivalently. Adoption of this method could increase the availability of plasma vitamin C analysis in clinical medicine.

  20. LARGE—A Plasma Torch for Surface Chemistry Applications and CVD Processes—A Status Report

    NASA Astrophysics Data System (ADS)

    Zimmermann, Stephan; Theophile, Eckart; Landes, Klaus; Schein, Jochen

    2008-12-01

    The LARGE ( LONG ARG GENERATOR) is a new generation DC-plasma torch featuring an extended arc which is operated with a perpendicular gas flow to create a wide (up to 45 cm) plasma jet well suited for large area plasma processing. Using plasma diagnostic systems like high speed imaging, enthalpy probe, emission spectroscopy, and tomography, the LARGE produced plasma jet characteristics have been measured and sources of instability have been identified. With a simple model/simulation of the system LARGE III-150 and numerous experimental results, a new nozzle configuration and geometry (LARGE IV-150) has been designed, which produces a more homogenous plasma jet. These improvements enable the standard applications of the LARGE plasma torch (CVD coating process and surface activation process) to operate with higher efficiency.

  1. Automatic hot wire GTA welding of pipe offers speed and increased deposition

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Sykes, I.; Digiacomo, J.

    1995-07-01

    Heavy-wall pipe welding for the power and petrochemical industry must meet code requirements. Contractors strive to meet these requirements in the most productive way possible. The challenge put to orbital welding equipment manufacturers is to produce pipe welding equipment that cost-effectively produces code-quality welds. Orbital welding equipment using the GTA process has long produced outstanding quality results but has lacked the deposition rate to compete cost effectively with other manual and semiautomatic processes such as SMAW, FCAW and GMAW. In recent years, significant progress has been made with the use of narrow-groove weld joint designs to reduce weld joint volumemore » and improve welding times. Astro Arc Polysoude, an orbital welding equipment manufacturer based in Sun Valley, Calif., and Nantes, France, has combined the hot wire GTAW process with orbital welding equipment using a narrow-groove weld joint design. Field test results show this process and procedure is a good alternative for many heavy-wall-pipe welding applications.« less

  2. Mobile three-dimensional visualisation technologies for clinician-led fall prevention assessments.

    PubMed

    Hamm, Julian; Money, Arthur G; Atwal, Anita; Ghinea, Gheorghita

    2017-08-01

    The assistive equipment provision process is routinely carried out with patients to mitigate fall risk factors via the fitment of assistive equipment within the home. However, currently, over 50% of assistive equipment is abandoned by the patients due to poor fit between the patient and the assistive equipment. This paper explores clinician perceptions of an early stage three-dimensional measurement aid prototype, which provides enhanced assistive equipment provision process guidance to clinicians. Ten occupational therapists trialled the three-dimensional measurement aid prototype application; think-aloud and semi-structured interview data was collected. Usability was measured with the System Usability Scale. Participants scored three-dimensional measurement aid prototype as 'excellent' and agreed strongly with items relating to the usability and learnability of the application. The qualitative analysis identified opportunities for improving existing practice, including, improved interpretation/recording measurements; enhanced collaborative practice within the assistive equipment provision process. Future research is needed to determine the clinical utility of this application compared with two-dimensional counterpart paper-based guidance leaflets.

  3. D.C. - ARC plasma generator for nonequilibrium plasmachemical processes

    NASA Astrophysics Data System (ADS)

    Kvaltin, J.

    1990-06-01

    The analysis of conditions for generation of nonequilibrium plasma to plasmachemical processes is made and the design of d.c.-arc plasma generator on the base of integral criterion is suggested. The measurement of potentials on the plasma column of that generator is presented.

  4. Vapor Phase Deposition Using Plasma Spray-PVD™

    NASA Astrophysics Data System (ADS)

    von Niessen, K.; Gindrat, M.; Refke, A.

    2010-01-01

    Plasma spray—physical vapor deposition (PS-PVD) is a low pressure plasma spray technology to deposit coatings out of the vapor phase. PS-PVD is a part of the family of new hybrid processes recently developed by Sulzer Metco AG (Switzerland) on the basis of the well-established low pressure plasma spraying (LPPS) technology. Included in this new process family are plasma spray—chemical vapor deposition (PS-CVD) and plasma spray—thin film (PS-TF) processes. In comparison to conventional vacuum plasma spraying and LPPS, these new processes use a high energy plasma gun operated at a work pressure below 2 mbar. This leads to unconventional plasma jet characteristics which can be used to obtain specific and unique coatings. An important new feature of PS-PVD is the possibility to deposit a coating not only by melting the feed stock material which builds up a layer from liquid splats, but also by vaporizing the injected material. Therefore, the PS-PVD process fills the gap between the conventional PVD technologies and standard thermal spray processes. The possibility to vaporize feedstock material and to produce layers out of the vapor phase results in new and unique coating microstructures. The properties of such coatings are superior to those of thermal spray and EB-PVD coatings. This paper reports on the progress made at Sulzer Metco to develop functional coatings build up from vapor phase of oxide ceramics and metals.

  5. Plasma Spraying of Ceramics with Particular Difficulties in Processing

    NASA Astrophysics Data System (ADS)

    Mauer, G.; Schlegel, N.; Guignard, A.; Jarligo, M. O.; Rezanka, S.; Hospach, A.; Vaßen, R.

    2015-01-01

    Emerging new applications and growing demands of plasma-sprayed coatings initiate the development of new materials. Regarding ceramics, often complex compositions are employed to achieve advanced material properties, e.g., high thermal stability, low thermal conductivity, high electronic and ionic conductivity as well as specific thermo-mechanical properties and microstructures. Such materials however, often involve particular difficulties in processing by plasma spraying. The inhomogeneous dissociation and evaporation behavior of individual constituents can lead to changes of the chemical composition and the formation of secondary phases in the deposited coatings. Hence, undesired effects on the coating characteristics are encountered. In this work, examples of such challenging materials are investigated, namely pyrochlores applied for thermal barrier coatings as well as perovskites for gas separation membranes. In particular, new plasma spray processes like suspension plasma spraying and plasma spray-physical vapor deposition are considered. In some cases, plasma diagnostics are applied to analyze the processing conditions.

  6. Fluorophore-based sensor for oxygen radicals in processing plasmas

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Choudhury, Faraz A.; Shohet, J. Leon, E-mail: shohet@engr.wisc.edu; Sabat, Grzegorz

    2015-11-15

    A high concentration of radicals is present in many processing plasmas, which affects the processing conditions and the properties of materials exposed to the plasma. Determining the types and concentrations of free radicals present in the plasma is critical in order to determine their effects on the materials being processed. Current methods for detecting free radicals in a plasma require multiple expensive and bulky instruments, complex setups, and often, modifications to the plasma reactor. This work presents a simple technique that detects reactive-oxygen radicals incident on a surface from a plasma. The measurements are made using a fluorophore dye thatmore » is commonly used in biological and cellular systems for assay labeling in liquids. Using fluorometric analysis, it was found that the fluorophore reacts with oxygen radicals incident from the plasma, which is indicated by degradation of its fluorescence. As plasma power was increased, the quenching of the fluorescence significantly increased. Both immobilized and nonimmobilized fluorophore dyes were used and the results indicate that both states function effectively under vacuum conditions. The reaction mechanism is very similar to that of the liquid dye.« less

  7. Modeling and analysis of power processing systems: Feasibility investigation and formulation of a methodology

    NASA Technical Reports Server (NTRS)

    Biess, J. J.; Yu, Y.; Middlebrook, R. D.; Schoenfeld, A. D.

    1974-01-01

    A review is given of future power processing systems planned for the next 20 years, and the state-of-the-art of power processing design modeling and analysis techniques used to optimize power processing systems. A methodology of modeling and analysis of power processing equipment and systems has been formulated to fulfill future tradeoff studies and optimization requirements. Computer techniques were applied to simulate power processor performance and to optimize the design of power processing equipment. A program plan to systematically develop and apply the tools for power processing systems modeling and analysis is presented so that meaningful results can be obtained each year to aid the power processing system engineer and power processing equipment circuit designers in their conceptual and detail design and analysis tasks.

  8. Teaching Contemporary Physics Topics Using Real-Time Data Obtained via the World Wide Web

    NASA Astrophysics Data System (ADS)

    Post-Zwicker, A. P.; Davis, W.; Grip, R.; McKay, M.; Pfaff, R.; Stotler, D. P.

    1999-12-01

    As a teaching tool, the World Wide Web (WWW) is unprecedented in its ability to transmit information and enhance communication between scientist and student. Just beginning to be developed are sites that actively engage the user in the learning process and provide hands-on methods of teaching contemporary topics. These topics are often not found in the classroom due to the complexity and expense of the laboratory equipment and the WWW is an ideal tool for overcoming this difficulty. This paper presents a model for using the Internet to teach high school students about plasma physics and fusion energy. Students are given access to real-time data, virtual experiments, and communication with professional scientists via email. Preliminary data indicate that student collaboration and student-led learning is encouraged when using the site in the classroom. Scientist/student mentoring is enhanced with this form of communication.

  9. Metal droplet erosion and shielding plasma layer under plasma flows typical of transient processes in tokamaks

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Martynenko, Yu. V., E-mail: Martynenko-YV@nrcki.ru

    It is shown that the shielding plasma layer and metal droplet erosion in tokamaks are closely interrelated, because shielding plasma forms from the evaporated metal droplets, while droplet erosion is caused by the shielding plasma flow over the melted metal surface. Analysis of experimental data and theoretical models of these processes is presented.

  10. 21 CFR 640.68 - Processing.

    Code of Federal Regulations, 2012 CFR

    2012-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Source Plasma § 640.68 Processing. (a) Sterile system. All administration and transfer sets inserted into blood containers used for processing Source Plasma intended for manufacturing into injectable or noninjectable products and all interior surfaces of plasma containers used for...

  11. 21 CFR 640.68 - Processing.

    Code of Federal Regulations, 2011 CFR

    2011-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Source Plasma § 640.68 Processing. (a) Sterile system. All administration and transfer sets inserted into blood containers used for processing Source Plasma intended for manufacturing into injectable or noninjectable products and all interior surfaces of plasma containers used for...

  12. 21 CFR 640.68 - Processing.

    Code of Federal Regulations, 2013 CFR

    2013-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Source Plasma § 640.68 Processing. (a) Sterile system. All administration and transfer sets inserted into blood containers used for processing Source Plasma intended for manufacturing into injectable or noninjectable products and all interior surfaces of plasma containers used for...

  13. 21 CFR 640.68 - Processing.

    Code of Federal Regulations, 2014 CFR

    2014-04-01

    ... STANDARDS FOR HUMAN BLOOD AND BLOOD PRODUCTS Source Plasma § 640.68 Processing. (a) Sterile system. All administration and transfer sets inserted into blood containers used for processing Source Plasma intended for manufacturing into injectable or noninjectable products and all interior surfaces of plasma containers used for...

  14. Impact of Magnetic Stirring on Stainless Steel Integrity: Effect on Biopharmaceutical Processing.

    PubMed

    Thompson, Christopher; Wilson, Kelly; Kim, Yoen Joo; Xie, Min; Wang, William K; Wendeler, Michaela

    2017-11-01

    Stainless steel containers are widely used in the pharmaceutical and biopharmaceutical industry for the storage of buffers, process intermediates, and purified drug substance. They are generally held to be corrosion resistant, biocompatible, and nonreactive, although it is well established that trace amounts of metal ions can leach from stainless steel equipment into biopharmaceutical products. We report here that the use of stainless steel containers in conjunction with magnetic stirring bars leads to significantly aggravated metal contamination, consisting of both metal particles and significantly elevated metal ions in solution, the degree of which is several orders of magnitude higher than described for static conditions. Metal particles are analyzed by scanning electron microscopy with electron-dispersive X-ray spectroscopy, and metal content in solution is quantitated at different time points by inductively coupled plasma-mass spectrometry. The concentration of iron, chromium, nickel, and manganese increases with increasing stirring time and speed. We describe the impact of buffer components on the extent of metal particles and ions in solution and illustrate the effect on model proteins. Copyright © 2017 American Pharmacists Association®. Published by Elsevier Inc. All rights reserved.

  15. Quantitative Characterization of Aqueous Byproducts from Hydrothermal Liquefaction of Municipal Wastes, Food Industry Wastes, and Biomass Grown on Waste

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Maddi, Balakrishna; Panisko, Ellen; Wietsma, Thomas

    Hydrothermal liquefaction (HTL) is a viable thermochemical process for converting wet solid wastes into biocrude which can be hydroprocessed to liquid transportation fuel blendstocks and specialty chemicals. The aqueous byproduct from HTL contains significant amounts (20 to 50%) of the feed carbon, which must be used to enhance economic sustainability of the process on an industrial scale. In this study, aqueous fractions produced from HTL of industrial and municipal waste were characterized using a wide variety of analytical approaches. Organic chemical compounds present in these aqueous fractions were identified using two-dimensional gas chromatography equipped with time-of-flight mass spectrometry. Identified compoundsmore » include organic acids, nitrogen compounds, alcohols, aldehydes, and ketones. Conventional gas chromatography and liquid chromatography methods were employed to quantify the identified compounds. Inorganic species, in the aqueous stream of hydrothermal liquefaction of these aqueous byproducts, also were quantified using ion chromatography and inductively coupled plasma optical emission spectroscopy. The concentrations of organic chemical compounds and inorganic species are reported, and the significance of these results is discussed in detail.« less

  16. Investigations of the surface activation of thermoplastic polymers by atmospheric pressure plasma treatment with a stationary plasma jet

    NASA Astrophysics Data System (ADS)

    Moritzer, Elmar; Nordmeyer, Timo; Leister, Christian; Schmidt, Martin Andreas; Grishin, Artur; Knospe, Alexander

    2016-03-01

    The production of high-quality thermoplastic parts often requires an additional process step after the injection molding stage. This may be a coating, bonding process or a 2K-injection moulding process. A commonly used process to improve the bond strength is atmospheric pressure plasma treatment. A variety of applications are realized with the aid of CNC systems. Although they ensure excellent reproducibility, they make it difficult to implement inline applications. This paper therefore examines the possibility of surface treatment using a stationary plasma jet. However, before it is possible to integrate this technology into a production process, preliminary trials need to be carried out to establish which factors influence the process. Experimental tests were performed using a special test set-up, enabling geometric, plasma-specific parameters to be identified. These results can help with the practical integration of this technology into existing production processes.

  17. Annular vortex merging processes in non-neutral electron plasmas

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Kaga, Chikato, E-mail: d146073@hiroshima-u.ac.jp; Ito, Kiyokazu; Higaki, Hiroyuki

    2015-06-29

    Non-neutral electron plasmas in a uniform magnetic field are investigated experimentally as a two dimensional (2D) fluid. Previously, it was reported that 2D phase space volume increases during a vortex merging process with viscosity. However, the measurement was restricted to a plasma with a high density. Here, an alternative method is introduced to evaluate a similar process for a plasma with a low density.

  18. The equipment access software for a distributed UNIX-based accelerator control system

    NASA Astrophysics Data System (ADS)

    Trofimov, Nikolai; Zelepoukine, Serguei; Zharkov, Eugeny; Charrue, Pierre; Gareyte, Claire; Poirier, Hervé

    1994-12-01

    This paper presents a generic equipment access software package for a distributed control system using computers with UNIX or UNIX-like operating systems. The package consists of three main components, an application Equipment Access Library, Message Handler and Equipment Data Base. An application task, which may run in any computer in the network, sends requests to access equipment through Equipment Library calls. The basic request is in the form Equipment-Action-Data and is routed via a remote procedure call to the computer to which the given equipment is connected. In this computer the request is received by the Message Handler. According to the type of the equipment connection, the Message Handler either passes the request to the specific process software in the same computer or forwards it to a lower level network of equipment controllers using MIL1553B, GPIB, RS232 or BITBUS communication. The answer is then returned to the calling application. Descriptive information required for request routing and processing is stored in the real-time Equipment Data Base. The package has been written to be portable and is currently available on DEC Ultrix, LynxOS, HPUX, XENIX, OS-9 and Apollo domain.

  19. 21 CFR 226.30 - Equipment.

    Code of Federal Regulations, 2010 CFR

    2010-04-01

    ... CURRENT GOOD MANUFACTURING PRACTICE FOR TYPE A MEDICATED ARTICLES Construction and Maintenance of Facilities and Equipment § 226.30 Equipment. Equipment used for the manufacture, processing, packaging, bulk... maintained in a clean and orderly manner and shall be of suitable design, size, construction, and location to...

  20. Contamination control methods for gases used in the microlithography process

    NASA Astrophysics Data System (ADS)

    Rabellino, Larry; Applegarth, Chuck; Vergani, Giorgio

    2002-07-01

    Sensitivity to contamination continues to increase as the technology shrinks from 365 nm I-line lamp illumination to 13.4 nm Extreme Ultraviolet laser activated plasma. Gas borne impurities can be readily distributed within the system, remaining both suspended in the gas and attached to critical surfaces. Effects from a variety of contamination, some well characterized and others not, remain a continuing obstacle for stepper manufacturers and users. Impurities like oxygen, moisture and hydrocarbons in parts per billion levels can absorb light, reducing the light intensity and subsequently reducing the consistence of the process. Moisture, sulfur compounds, ammonia, acid compounds and organic compounds such as hydrocarbons can deposit on lens or mirror surfaces affecting image quality. Regular lens replacement or removal for cleaning is a costly option and in-situ cleaning processes must be carefully managed to avoid recontamination of the system. The contamination can come from outside the controlled environment (local gas supply, piping system, & leaks), or from the materials moving into the controlled environment; or contamination may be generated inside the controlled environment as a result of the process itself. The release of amines can occur as a result of the degassing of the photo-resists. For the manufacturer and user of stepper equipment, the challenge is not in predictable contamination, but the variable or unpredictable contamination in the process. One type of unpredictable contamination may be variation in the environmental conditions when producing the nitrogen gas and Clean Dry Air (CDA). Variation in the CDA, nitrogen and xenon may range from parts per billion to parts per million. The risk due to uncontrolled or unmonitored variation in gas quality can be directly related to product defects. Global location can significantly affect the gas quality, due to the ambient air quality (for nitrogen and CDA), production methods, gas handling equipment maintenance, transportation and storage processes. Fortunately, technology has been developed which can remove the killer impurities from these processes. This paper will review processes, and purification media that can be used in the photolithography processes, and detail the advances in purification technologies for removal of hydrocarbons, oxygen (where applicable), moisture, carbon dioxide, carbon monoxide, hydrogen, nitrogen (where applicable), sulfur compounds, ammonia and acid compounds from process gases such as nitrogen, CDA, argon, krypton and xenon.

  1. NASA-STD-(I)-6016, Standard Materials and Processes Requirements for Spacecraft

    NASA Technical Reports Server (NTRS)

    Pedley, Michael; Griffin, Dennis

    2006-01-01

    This document is directed toward Materials and Processes (M&P) used in the design, fabrication, and testing of flight components for all NASA manned, unmanned, robotic, launch vehicle, lander, in-space and surface systems, and spacecraft program/project hardware elements. All flight hardware is covered by the M&P requirements of this document, including vendor designed, off-the-shelf, and vendor furnished items. Materials and processes used in interfacing ground support equipment (GSE); test equipment; hardware processing equipment; hardware packaging; and hardware shipment shall be controlled to prevent damage to or contamination of flight hardware.

  2. Bactericidal active ingredient in cryopreserved plasma-treated water with the reduced-pH method for plasma disinfection

    NASA Astrophysics Data System (ADS)

    Kitano, Katsuhisa; Ikawa, Satoshi; Nakashima, Yoichi; Tani, Atsushi; Yokoyama, Takashi; Ohshima, Tomoko

    2016-09-01

    For the plasma disinfection of human body, plasma sterilization in liquid is crucial. We found that the plasma-treated water (PTW) has strong bactericidal activity under low pH condition. Physicochemical properties of PTW is discussed based on chemical kinetics. Lower temperature brings longer half-life and the bactericidal activity of PTW can be kept by cryopreservation. High performance PTW, corresponding to the disinfection power of 22 log reduction (B. subtilis spore), can be obtained by special plasma system equipped with cooling device. This is equivalent to 65% H2O2, 14% sodium hypochlorite and 0.33% peracetic acid, which are deadly poison for human. But, it is deactivated soon at higher temperature (4 sec. at body temperature), and toxicity to human body seems low. For dental application, PTW was effective on infected models of human extracted tooth. Although PTW has many chemical components, respective chemical components in PTW were isolated by ion chromatography. In addition to peaks of H2O2, NO2- and NO3-, a specific peak was detected. and only this fraction had bactericidal activity. Purified active ingredient of PTW is the precursor of HOO, and further details will be discussed in the presentation. MEXT (15H03583, 23340176, 25108505). NCCE (23-A-15).

  3. Plasma contactor research, 1989

    NASA Technical Reports Server (NTRS)

    Williams, John D.

    1990-01-01

    The characteristics of double layers observed by researchers investigating magnetospheric phenomena are contrasted to those observed in plasma contacting experiments. Experiments in the electron collection mode of the plasma contacting process were performed and the results confirm a simple model of this process for current levels ranging to 3 A. Experimental results were also obtained in a study of the process of electron emission from a hollow cathode plasma contactor. High energy ions are observed coming from the cathode in addition to the electrons and a phenomenological model that suggests a mechanism by which this could occur is presented. Experimental results showing the effects of the design parameters of the ambient plasma simulator on the plasma potential, electron temperature, electron density and plasma noise levels induced in plasma contacting experiments are presented. A preferred simulator design is selected on the basis of these results.

  4. Meat and Poultry Processing. Teacher Edition.

    ERIC Educational Resources Information Center

    Oklahoma State Dept. of Vocational and Technical Education, Stillwater. Curriculum and Instructional Materials Center.

    This curriculum guide contains instructional materials for a program that provides students with job skills in meat and poultry processing. The curriculum consists of 10 units that cover the following material: orientation to meat and poultry processing; maintaining plant facilities; equipment and equipment maintenance; purchasing livestock for…

  5. Bacterial spore inactivation induced by cold plasma.

    PubMed

    Liao, Xinyu; Muhammad, Aliyu Idris; Chen, Shiguo; Hu, Yaqin; Ye, Xingqian; Liu, Donghong; Ding, Tian

    2018-04-05

    Cold plasma has emerged as a non-thermal technology for microbial inactivation in the food industry over the last decade. Spore-forming microorganisms pose challenges for microbiological safety and for the prevention of food spoilage. Inactivation of spores induced by cold plasma has been reported by several studies. However, the exact mechanism of spore deactivation by cold plasma is poorly understood; therefore, it is difficult to control this process and to optimize cold plasma processing for efficient spore inactivation. In this review, we summarize the factors that affect the resistance of spores to cold plasma, including processing parameters, environmental elements, and spore properties. We then describe possible inactivation targets in spore cells (e.g., outer structure, DNA, and metabolic proteins) that associated with inactivation by cold plasma according to previous studies. Kinetic models of the sporicidal activity of cold plasma have also been described here. A better understanding of the interaction between spores and cold plasma is essential for the development and optimization of cold plasma technology in food the industry.

  6. How to Ignite an Atmospheric Pressure Microwave Plasma Torch without Any Additional Igniters

    PubMed Central

    Leins, Martina; Gaiser, Sandra; Schulz, Andreas; Walker, Matthias; Schumacher, Uwe; Hirth, Thomas

    2015-01-01

    This movie shows how an atmospheric pressure plasma torch can be ignited by microwave power with no additional igniters. After ignition of the plasma, a stable and continuous operation of the plasma is possible and the plasma torch can be used for many different applications. On one hand, the hot (3,600 K gas temperature) plasma can be used for chemical processes and on the other hand the cold afterglow (temperatures down to almost RT) can be applied for surface processes. For example chemical syntheses are interesting volume processes. Here the microwave plasma torch can be used for the decomposition of waste gases which are harmful and contribute to the global warming but are needed as etching gases in growing industry sectors like the semiconductor branch. Another application is the dissociation of CO2. Surplus electrical energy from renewable energy sources can be used to dissociate CO2 to CO and O2. The CO can be further processed to gaseous or liquid higher hydrocarbons thereby providing chemical storage of the energy, synthetic fuels or platform chemicals for the chemical industry. Applications of the afterglow of the plasma torch are the treatment of surfaces to increase the adhesion of lacquer, glue or paint, and the sterilization or decontamination of different kind of surfaces. The movie will explain how to ignite the plasma solely by microwave power without any additional igniters, e.g., electric sparks. The microwave plasma torch is based on a combination of two resonators — a coaxial one which provides the ignition of the plasma and a cylindrical one which guarantees a continuous and stable operation of the plasma after ignition. The plasma can be operated in a long microwave transparent tube for volume processes or shaped by orifices for surface treatment purposes. PMID:25938699

  7. Correlation between the plasma characteristics and the surface chemistry of plasma-treated polymers through partial least-squares analysis.

    PubMed

    Mavadat, Maryam; Ghasemzadeh-Barvarz, Massoud; Turgeon, Stéphane; Duchesne, Carl; Laroche, Gaétan

    2013-12-23

    We investigated the effect of various plasma parameters (relative density of atomic N and H, plasma temperature, and vibrational temperature) and process conditions (pressure and H2/(N2 + H2) ratio) on the chemical composition of modified poly(tetrafluoroethylene) (PTFE). The plasma parameters were measured by means of near-infrared (NIR) and UV-visible emission spectroscopy with and without actinometry. The process conditions of the N2-H2 microwave discharges were set at various pressures ranging from 100 to 2000 mTorr and H2/(N2+H2) gas mixture ratios between 0 and 0.4. The surface chemical composition of the modified polymers was determined by X-ray photoelectron spectroscopy (XPS). A mathematical model was constructed using the partial least-squares regression algorithm to correlate the plasma information (process condition and plasma parameters as determined by emission spectroscopy) with the modified surface characteristics. To construct the model, a set of data input variables containing process conditions and plasma parameters were generated, as well as a response matrix containing the surface composition of the polymer. This model was used to predict the composition of PTFE surfaces subjected to N2-H2 plasma treatment. Contrary to what is generally accepted in the literature, the present data demonstrate that hydrogen is not directly involved in the defluorination of the surface but rather produces atomic nitrogen and/or NH radicals that are shown to be at the origin of fluorine atom removal from the polymer surface. The results show that process conditions alone do not suffice in predicting the surface chemical composition and that the plasma characteristics, which cannot be easily correlated with these conditions, should be considered. Process optimization and control would benefit from plasma diagnostics, particularly infrared emission spectroscopy.

  8. Analog to digital converter system for temperature monitoring -- B, C, D, DR, F, and H reactors

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Ballowe, J.W.

    1961-03-23

    This document discusses a proposal that certain presently installed reactor process water outlet temperature data logging equipment in subject reactors to be replaced with new functionally simplified equipment of a more adequate design. The primary purpose of the proposed installation is to replace existing equipment which is obsolete and in three reactors is worn out to the point where the equipment is out of service frequently for periods of time up to 8 hours or more. The new equipment will provide reliable process tube temperature information for use in the functions of reactor control and product accountability. Based upon anticipatedmore » incremental production gains resulting from use of the new equipment, the amortization period for the project is calculated at 2.7 years.« less

  9. KENNEDY SPACE CENTER, FLA. - STS-114 Mission Commander Eileen Collins looks over flight equipment in the Orbiter Processing Facility, along with Glenda Laws, EVA Task Leader, with United Space Alliance at Johnson Space Center. The STS-114 crew is at KSC to take part in crew equipment and orbiter familiarization.

    NASA Image and Video Library

    2003-10-30

    KENNEDY SPACE CENTER, FLA. - STS-114 Mission Commander Eileen Collins looks over flight equipment in the Orbiter Processing Facility, along with Glenda Laws, EVA Task Leader, with United Space Alliance at Johnson Space Center. The STS-114 crew is at KSC to take part in crew equipment and orbiter familiarization.

  10. [Development of Hospital Equipment Maintenance Information System].

    PubMed

    Zhou, Zhixin

    2015-11-01

    Hospital equipment maintenance information system plays an important role in improving medical treatment quality and efficiency. By requirement analysis of hospital equipment maintenance, the system function diagram is drawed. According to analysis of input and output data, tables and reports in connection with equipment maintenance process, relationships between entity and attribute is found out, and E-R diagram is drawed and relational database table is established. Software development should meet actual process requirement of maintenance and have a friendly user interface and flexible operation. The software can analyze failure cause by statistical analysis.

  11. Experimental validation of a phenomenological model of the plasma contacting process

    NASA Technical Reports Server (NTRS)

    Williams, John D.; Wilbur, Paul J.; Monheiser, Jeff M.

    1988-01-01

    A preliminary model of the plasma coupling process is presented which describes the phenomena observed in ground-based experiments using a hollow cathode plasma contactor to collect electrons from a dilute ambient plasma under conditions where magnetic field effects can be neglected. The locations of the double-sheath region boundaries are estimated and correlated with experimental results. Ion production mechanisms in the plasma plume caused by discharge electrons from the contactor cathode and by electrons streaming into the plasma plume through the double-sheath from the ambient plasma are also discussed.

  12. 50 CFR 260.102 - Equipment.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... 50 Wildlife and Fisheries 9 2011-10-01 2011-10-01 false Equipment. 260.102 Section 260.102... Products for Human Consumption Requirements for Plants Operating Under Continuous Inspection on A Contract Basis 1 § 260.102 Equipment. All equipment used for receiving, washing, segregating, picking, processing...

  13. Cost of ownership for inspection equipment

    NASA Astrophysics Data System (ADS)

    Dance, Daren L.; Bryson, Phil

    1993-08-01

    Cost of Ownership (CoO) models are increasingly a part of the semiconductor equipment evaluation and selection process. These models enable semiconductor manufacturers and equipment suppliers to quantify a system in terms of dollars per wafer. Because of the complex nature of the semiconductor manufacturing process, there are several key attributes that must be considered in order to accurately reflect the true 'cost of ownership'. While most CoO work to date has been applied to production equipment, the need to understand cost of ownership for inspection and metrology equipment presents unique challenges. Critical parameters such as detection sensitivity as a function of size and type of defect are not included in current CoO models yet are, without question, major factors in the technical evaluation process and life-cycle cost. This paper illustrates the relationship between these parameters, as components of the alpha and beta risk, and cost of ownership.

  14. Multi-spark discharge system for preparation of nutritious water

    NASA Astrophysics Data System (ADS)

    Nakaso, Tetsushi; Harigai, Toru; Kusumawan, Sholihatta Aziz; Shimomura, Tomoya; Tanimoto, Tsuyoshi; Suda, Yoshiyuki; Takikawa, Hirofumi

    2018-01-01

    The nitrogen compound concentration in water is increased by atmospheric-pressure plasma discharge treatment. A rod-to-water electrode discharge treatment system using plasma discharge has been developed by our group to obtain water with a high concentration of nitrogen compounds, and this plasma-treated water improves the growth of chrysanthemum roots. However, it is difficult to apply the system to the agriculture because the amount of treated water obtained by using the system too small. In this study, a multi-spark discharge system (MSDS) equipped multiple spark plugs is presented to obtain a large amount of plasma-treated water. The MSDS consisted of inexpensive parts in order to reduce the system introduction cost for agriculture. To suppress the temperature increase of the spark plugs, the 9 spark plugs were divided into 3 groups, which were discharged in order. The plasma-treated water with a NO3- concentration of 50 mg/L was prepared using the MSDS for 90 min, and the treatment efficiency was about 6 times higher than that of our previous system. It was confirmed that the NO2-, O3, and H2O2 concentrations in the water were also increased by treating the water using the MSDS.

  15. Influence of Spectral Transfer Processes in Compressible Low Frequency Plasma Turbulence on Scattering and Refraction of Electromagnetic Signals

    DTIC Science & Technology

    2015-01-01

    AFRL-RY-WP-TR-2014-0230 INFLUENCE OF SPECTRAL TRANSFER PROCESSES IN COMPRESSIBLE LOW FREQUENCY PLASMA TURBULENCE ON SCATTERING AND...INFLUENCE OF SPECTRAL TRANSFER PROCESSES IN COMPRESSIBLE LOW FREQUENCY PLASMA TURBULENCE ON SCATTERING AND REFRACTION OF ELECTROMAGNETIC SIGNALS 5a...research is to analyze influence of plasma turbulence on hypersonic sensor systems and NGOTHR applications and to meet the Air Force’s ever-increasing

  16. Pacifichem 2000 Symposium on Plasma Chemistry and Technology for Green Manufacturing, Pollution Control and Processing Applications

    DTIC Science & Technology

    2001-03-19

    Plasma chemistry and technology represents a significant advance and improvement for green manufacturing, pollution control, and various processing...December 14-19, 2000 in Honolulu, HI. This Congress consists of over 120 symposia. amongst them the Symposium on Plasma Chemistry and Technology for...in the plasma chemistry many field beyond the more traditional and mature fields of semiconductor and materials processing. This symposium was focus on

  17. Plasma observations of the active mother-daughter payload MAIMIK in the lower thermosphere

    NASA Astrophysics Data System (ADS)

    Friedrich, M.; Torkar, K. M.; Troim, J.; Maehlum, B. N.

    1991-03-01

    Observations during the re-entry into the denser atmosphere of a mother-daughter payload equipped with a powerful electron gun are reported. The behavior of the payload potential, the flux of returning electrons and the propagation of an HF signal differed drastically at heights below approx. 130 km from what was observed in the F-region; in particular, the payload potential remained well below the accelerator voltage. A 10 MHz signal transmitted between daughter and mother showed variations both in phase and amplitude, whereas no such signatures were seen earlier in the flight when the two bodies were closer to each other. The most likely explanation is based on an increase in plasma density near the payloads in denser regions of the atmosphere. The dynamics of the effects are discussed in terms of ion plasma waves, although no firm conclusions can be drawn.

  18. Characteristics and applications of diffuse discharge of water electrode in air

    NASA Astrophysics Data System (ADS)

    Wenzheng, LIU; Tahan, WANG; Xiaozhong, CHEN; Chuanlong, MA

    2018-01-01

    Plasma water treatment technology, which aims to produce strong oxidizing reactive particles that act on the gas-liquid interface by way of discharging, is used to treat the organic pollutants that do not degrade easily in water. This paper presents a diffuse-discharge plasma water treatment method, which is realized by constructing a conical air gap through an uneven medium layer. The proposed method uses water as one electrode, and a dielectric barrier discharge electrode is constructed by using an uneven dielectric. The electric field distribution in the discharge space will be uneven, wherein the long gap electric field will have a smaller intensity, while the short one will have a larger intensity. A diffuse glow discharge is formed in the cavity. With this type of plasma water treatment equipment, a methyl orange solution with a concentration of 10 mg l-1 was treated, and the removal rate was found to reach 88.96%.

  19. Determination of trace amounts of cobalt in blood

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Godlewska, B.; Hulanicki, A.; Abou-Shakra, F.R.

    1994-11-01

    The analysis of cobalt in whole blood and blood fractions has been carried out using three different analytical techniques namely, electrothermal atomic absorption spectrometry, inductively coupled plasma mass spectrometry and cathodic stripping voltammetry. This study showed that inductively coupled plasma mass spectrometry was the better equipped technique for conducting such analyses due to its low detection limits and wide linear dynamic range. The results ranged between 0.7 - 2.62 {mu}g/l for plasma, 1.02 - 2.31 {mu}g/l for serum, and 0.66 - 1.28 {mu}g/l for whole blood. The introduction of different forms of cobalt to Wistar rats resulted in a differingmore » distribution of the element between serum and whole blood. This observation suggests that there are at least two modes of Co uptake and transport depending on the administered or taken chemical form.« less

  20. Cold plasma processing to improve food safety

    USDA-ARS?s Scientific Manuscript database

    Cold plasma is an antimicrobial process being developed for application as a food processing technology. This novel intervention is the subject of an expanding research effort by groups around the world. A variety of devices can be used to generate cold plasma and apply it to the food commodity bein...

  1. Manufacturing Laboratory for Next Generation Engineers

    DTIC Science & Technology

    2013-12-16

    automated CNC machines, rapid prototype systems, robotic assembly systems, metrology , and non-traditional systems such as a waterjet cutter, EDM machine...CNC machines, rapid prototype systems, robotic assembly systems, metrology , and non-traditional systems such as a waterjet cutter, EDM machine, plasma...System Metrology and Quality Control Equipment - This area already had a CMM and other well known quality control instrumentation. It has been enhanced

  2. Measurement of plasma decay processes in mixture of sodium and argon by coherent microwave scattering

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Zhang Zhili; Shneider, Mikhail N.

    2010-03-15

    This paper presents the experimental measurement and computational model of sodium plasma decay processes in mixture of sodium and argon by using radar resonance-enhanced multiphoton ionization (REMPI), coherent microwave Rayleigh scattering of REMPI. A single laser beam resonantly ionizes the sodium atoms by means of 2+1 REMPI process. The laser beam can only generate the ionization of the sodium atoms and have negligible ionization of argon. Coherent microwave scattering in situ measures the total electron number in the laser-induced plasma. Since the sodium ions decay by recombination with electrons, microwave scattering directly measures the plasma decay processes of the sodiummore » ions. A theoretical plasma dynamic model, including REMPI of the sodium and electron avalanche ionization (EAI) of sodium and argon in the gas mixture, has been developed. It confirms that the EAI of argon is several orders of magnitude lower than the REMPI of sodium. The theoretical prediction made for the plasma decay process of sodium plasma in the mixture matches the experimental measurement.« less

  3. Characterization of microbial growth on processing equipment by electrochemical impedance spectroscopy

    USDA-ARS?s Scientific Manuscript database

    Microbial activity that leads to the formation of biofilms on process equipment can accelerate corrosion, reduce heat transfer rates, and generally decrease process efficiencies. Additional concerns arise in the food and pharma industries where product quality and safety are a high priority. Followi...

  4. Automotive Manufacturing Processes. Volume V - Manufacturing Processes and Equipment for the Mass Production and Assembly of Motor Vehicles

    DOT National Transportation Integrated Search

    1981-02-01

    Extensive material substitution and resizing of the domestic automotive fleet, as well as the introduction of new technologies, will require major changes in the techniques and equipment used in the various manufacturing processes employed in the pro...

  5. 40 CFR 57.203 - Contents of the application.

    Code of Federal Regulations, 2014 CFR

    2014-07-01

    ... application shall also contain the following information: (1) A process flow diagram of the smelter, including current process and instrumentation diagrams for all processes or equipment which may emit or affect the... equipment (flow rates, temperature, volumes, compositions, and variations over time); and a list of all...

  6. 40 CFR 57.203 - Contents of the application.

    Code of Federal Regulations, 2012 CFR

    2012-07-01

    ... application shall also contain the following information: (1) A process flow diagram of the smelter, including current process and instrumentation diagrams for all processes or equipment which may emit or affect the... equipment (flow rates, temperature, volumes, compositions, and variations over time); and a list of all...

  7. 40 CFR 57.203 - Contents of the application.

    Code of Federal Regulations, 2011 CFR

    2011-07-01

    ... application shall also contain the following information: (1) A process flow diagram of the smelter, including current process and instrumentation diagrams for all processes or equipment which may emit or affect the... equipment (flow rates, temperature, volumes, compositions, and variations over time); and a list of all...

  8. 40 CFR 57.203 - Contents of the application.

    Code of Federal Regulations, 2013 CFR

    2013-07-01

    ... application shall also contain the following information: (1) A process flow diagram of the smelter, including current process and instrumentation diagrams for all processes or equipment which may emit or affect the... equipment (flow rates, temperature, volumes, compositions, and variations over time); and a list of all...

  9. A method to accelerate creation of plasma etch recipes using physics and Bayesian statistics

    NASA Astrophysics Data System (ADS)

    Chopra, Meghali J.; Verma, Rahul; Lane, Austin; Willson, C. G.; Bonnecaze, Roger T.

    2017-03-01

    Next generation semiconductor technologies like high density memory storage require precise 2D and 3D nanopatterns. Plasma etching processes are essential to achieving the nanoscale precision required for these structures. Current plasma process development methods rely primarily on iterative trial and error or factorial design of experiment (DOE) to define the plasma process space. Here we evaluate the efficacy of the software tool Recipe Optimization for Deposition and Etching (RODEo) against standard industry methods at determining the process parameters of a high density O2 plasma system with three case studies. In the first case study, we demonstrate that RODEo is able to predict etch rates more accurately than a regression model based on a full factorial design while using 40% fewer experiments. In the second case study, we demonstrate that RODEo performs significantly better than a full factorial DOE at identifying optimal process conditions to maximize anisotropy. In the third case study we experimentally show how RODEo maximizes etch rates while using half the experiments of a full factorial DOE method. With enhanced process predictions and more accurate maps of the process space, RODEo reduces the number of experiments required to develop and optimize plasma processes.

  10. Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low T{sub e} plasma sources

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Jagtiani, Ashish V.; Miyazoe, Hiroyuki; Chang, Josephine

    2016-01-15

    The ability to achieve atomic layer precision is the utmost goal in the implementation of atomic layer etch technology. Carbon-based materials such as carbon nanotubes (CNTs) and graphene are single atomic layers of carbon with unique properties and, as such, represent the ultimate candidates to study the ability to process with atomic layer precision and assess impact of plasma damage to atomic layer materials. In this work, the authors use these materials to evaluate the atomic layer processing capabilities of electron beam generated plasmas. First, the authors evaluate damage to semiconducting CNTs when exposed to beam-generated plasmas and compare thesemore » results against the results using typical plasma used in semiconductor processing. The authors find that the beam generated plasma resulted in significantly lower current degradation in comparison to typical plasmas. Next, the authors evaluated the use of electron beam generated plasmas to process graphene-based devices by functionalizing graphene with fluorine, nitrogen, or oxygen to facilitate atomic layer deposition (ALD). The authors found that all adsorbed species resulted in successful ALD with varying impact on the transconductance of the graphene. Furthermore, the authors compare the ability of both beam generated plasma as well as a conventional low ion energy inductively coupled plasma (ICP) to remove silicon nitride (SiN) deposited on top of the graphene films. Our results indicate that, while both systems can remove SiN, an increase in the D/G ratio from 0.08 for unprocessed graphene to 0.22 to 0.26 for the beam generated plasma, while the ICP yielded values from 0.52 to 1.78. Generally, while some plasma-induced damage was seen for both plasma sources, a much wider process window as well as far less damage to CNTs and graphene was observed when using electron beam generated plasmas.« less

  11. Fibrinogen Reduction During Selective Plasma Exchange due to Membrane Fouling.

    PubMed

    Ohkubo, Atsushi; Okado, Tomokazu; Miyamoto, Satoko; Hashimoto, Yurie; Komori, Shigeto; Yamamoto, Motoki; Maeda, Takuma; Itagaki, Ayako; Yamamoto, Hiroko; Seshima, Hiroshi; Kurashima, Naoki; Iimori, Soichiro; Naito, Shotaro; Sohara, Eisei; Uchida, Shinichi; Rai, Tatemitsu

    2017-06-01

    Fibrinogen is substantially reduced by most plasmapheresis modalities but retained in selective plasma exchange using Evacure EC-4A10 (EC-4A). Although EC-4A's fibrinogen sieving coefficient is 0, a session of selective plasma exchange reduced fibrinogen by approximately 19%. Here, we investigated sieving coefficient in five patients. When the mean processed plasma volume was 1.15 × plasma volume, the mean reduction of fibrinogen during selective plasma exchange was approximately 15%. Fibrinogen sieving coefficient was 0 when the processed plasma volume was 1.0 L, increasing to 0.07 when the processed plasma volume was 3.0 L, with a mean of 0.03 during selective plasma exchange. When fibrinogen sieving coefficient was 0, selective plasma exchange reduced fibrinogen by approximately 10%. Scanning electron microscopy images revealed internal fouling of EC-4A's hollow fiber membrane by substances such as fibrinogen fibrils. Thus, fibrinogen reduction by selective plasma exchange may be predominantly caused by membrane fouling rather than filtration. © 2017 International Society for Apheresis, Japanese Society for Apheresis, and Japanese Society for Dialysis Therapy.

  12. Membrane versus centrifuge-based therapeutic plasma exchange: a randomized prospective crossover study.

    PubMed

    Hafer, Carsten; Golla, Paulina; Gericke, Marion; Eden, Gabriele; Beutel, Gernot; Schmidt, Julius J; Schmidt, Bernhard M W; De Reys, Stef; Kielstein, Jan T

    2016-01-01

    Therapeutic plasma exchange (TPE) is either performed using a highly permeable filter with standard multifunctional renal replacement equipment (mTPE) or a centrifugation device (cTPE). Although both techniques are well established in clinical practice, performance of these two modes of TPE was never compared in a prospective randomized fashion. Thus we aimed to compare two commercially available therapeutic apheresis systems: mTPE (Octonova with Plasmaflo filter) and cTPE (Spectra Optia apheresis system). Twenty-one patients (age 51.6 ± 13.5 years; 10 F/11 M; BMI 25.1 ± 5.0 kg/m(2)) were enrolled in this randomized, prospective, paired, crossover study performed in the Hannover Medical School, Germany. First treatment (either mTPE or cTPE) was chosen by an online randomization list. The primary endpoints were plasma removal efficiency with 1.2× of the total plasma volume exchanged. Secondary endpoints were total amount of plasma substances removed, such as IgG and fibrinogen. Further, the treatment effect on platelet count and complications were evaluated. Despite a comparable volume of the processed plasma, mTPE treatment time was 10.5 % longer than cTPE treatment time (p < 0.05), resulting in a 10 % lower plasma removal rate of the mTPE treatment. Both treatments were comparable in terms of decrease in median (IQR) IgG [pre-mTPE 5.34 (3.48-8.37), post-mTPE 1.96 (1.43-2.84) g/L; pre-cTPE 5.88 (3.42-8.84), post-cTPE 1.89 (1.21-3.52) g/L]. Also the median (IQR) amount of IgG removed in mTPE [13.14 (7.42-16.10) g] was not different from the cTPE treatment [9.30 (6.26-15.69) g]. This was also true for IgM removal. Platelet loss during mTPE was nearly twice as much as with cTPE (15 ± 9 versus 7 ± 9 %, p < 0.05). Although the centrifugal procedures were conducted using flow rates that could easily be obtained using peripheral access, plasma removal efficiency was significantly higher and treatment time was significantly lower in cTPE as compared to mTPE. Despite this lower treatment time, the decline in markers of procedure efficacy was comparable. Especially in centers performing many procedures per year, cTPE in contrast to mTPE can reduce treatment time without compromising treatment efficacy.

  13. Method for atmospheric pressure reactive atom plasma processing for surface modification

    DOEpatents

    Carr, Jeffrey W [Livermore, CA

    2009-09-22

    Reactive atom plasma processing can be used to shape, polish, planarize and clean the surfaces of difficult materials with minimal subsurface damage. The apparatus and methods use a plasma torch, such as a conventional ICP torch. The workpiece and plasma torch are moved with respect to each other, whether by translating and/or rotating the workpiece, the plasma, or both. The plasma discharge from the torch can be used to shape, planarize, polish, and/or clean the surface of the workpiece, as well as to thin the workpiece. The processing may cause minimal or no damage to the workpiece underneath the surface, and may involve removing material from the surface of the workpiece.

  14. Optimal Medical Equipment Maintenance Service Proposal Decision Support System combining Activity Based Costing (ABC) and the Analytic Hierarchy Process (AHP).

    PubMed

    da Rocha, Leticia; Sloane, Elliot; M Bassani, Jose

    2005-01-01

    This study describes a framework to support the choice of the maintenance service (in-house or third party contract) for each category of medical equipment based on: a) the real medical equipment maintenance management system currently used by the biomedical engineering group of the public health system of the Universidade Estadual de Campinas located in Brazil to control the medical equipment maintenance service, b) the Activity Based Costing (ABC) method, and c) the Analytic Hierarchy Process (AHP) method. Results show the cost and performance related to each type of maintenance service. Decision-makers can use these results to evaluate possible strategies for the categories of equipment.

  15. PREFACE: 26th Symposium on Plasma Science for Materials (SPSM-26)

    NASA Astrophysics Data System (ADS)

    2014-06-01

    26th Symposium on Plasma Science for Materials (SPSM-26) Takayuki Watanabe The 26th Symposium on Plasma Science for Materials (SPSM-26) was held in Fukuoka, Japan on September 23-24, 2013. SPSM has been held annually since 1988 under the sponsorship of The 153rd Committee on Plasma Materials Science, Japan Society for the Promotion of Science (JSPS). This symposium is one of the major activities of the Committee, which is organized by researchers in academia and industry for the purpose of advancing intersectional scientific information exchange and discussion of science and technology of plasma materials processing. Plasma processing have attracted extensive attention due to their unique advantages, and it is expected to be utilized for a number of innovative industrial applications such as synthesis of high-quality and high-performance nanomaterials. The advantages of plasmas including high chemical reactivity in accordance with required chemical reactions are beneficial for innovative processing. In recent years, plasma materials processing with reactive plasmas has been extensively employed in the fields of environmental issues and biotechnology. This conference seeks to bring different scientific communities together to create a forum for discussing the latest developments and issues. The conference provides a platform for the exploration of both fundamental topics and new applications of plasmas by the contacts between science, technology, and industry. The conference was organized in plenary lectures, invited, contributed oral presentations, and poster sessions. At this meeting, we had 142 participants from 10 countries and 104 presentations, including 11 invited presentations. This year, we arranged special topical sessions that cover Plasma Medicine and Biotechnologies, Business and Academia Cooperation, Plasma with Liquids, Plasma Processes for Nanomaterials, together with Basic, Electronics, and Thermal Plasma sessions. This special issue presents 28 papers that are selected via strict peer-review process from full papers submitted for the proceedings of the conference. The topics range from basic physics and chemistry of plasma processing to a broad variety of materials processing and environmental applications. This proceeding offers an overview on the recent advances in thermal and non-equilibrium plasmas as well as the challenges ahead in the field of plasma research and applications among engineers and scientists. It is an honor to present this volume of Journal of Physics: Conference Series and we deeply thank the authors for their enthusiastic and high-grade contribution. The editors hope that this proceeding will be useful and helpful for deepening our understanding of science and technology of plasma materials processing and also for stimulating further development of the plasma technology. Finally, I would like to thank the organizing committee and organizing secretariat of SPSM-26, and the participants of the conference for contribution to a successful and exciting meeting. The conference was chaired by Prof. Masaharu Shiratani, Kyushu University. I would also like to thank the financial support from The 153rd Committee on Plasma Materials Science. Editors of SPMS-26 Prof Takayuki Watanabe, Kyushu University, Japan Prof Makoto Sekine, Nagoya University, Japan Prof Takanori Ichiki, The University of Tokyo, Japan Prof Masaharu Shiratani, Kyushu University, Japan Prof Akimitsu Hatta, Kochi University of Technology, Japan Sponsors and Supporting Organization: The 153rd Committee on Plasma Materials Science, Japan Society for the Promotion of Science

  16. 47 CFR 73.1610 - Equipment tests.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... 47 Telecommunication 4 2010-10-01 2010-10-01 false Equipment tests. 73.1610 Section 73.1610... Rules Applicable to All Broadcast Stations § 73.1610 Equipment tests. (a) During the process of..., without further authority from the FCC, conduct equipment tests for the purpose of making such adjustments...

  17. 47 CFR 73.1610 - Equipment tests.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... 47 Telecommunication 4 2011-10-01 2011-10-01 false Equipment tests. 73.1610 Section 73.1610... Rules Applicable to All Broadcast Stations § 73.1610 Equipment tests. (a) During the process of..., without further authority from the FCC, conduct equipment tests for the purpose of making such adjustments...

  18. 47 CFR 73.1610 - Equipment tests.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... 47 Telecommunication 4 2012-10-01 2012-10-01 false Equipment tests. 73.1610 Section 73.1610... Rules Applicable to All Broadcast Stations § 73.1610 Equipment tests. (a) During the process of..., without further authority from the FCC, conduct equipment tests for the purpose of making such adjustments...

  19. Advanced planning surveys using automatic license plate reading equipment and evaluation of automatic license plate reading equipment for advanced planning

    DOT National Transportation Integrated Search

    1998-05-01

    Recent technological advances in computer hardware, software, and image processing have led to the development of automated license plate reading equipment. This equipment has primarily been developed for enforcement and security applications, such a...

  20. Research Activities at Plasma Research Laboratory at NASA Ames Research Center

    NASA Technical Reports Server (NTRS)

    Sharma, S. P.; Rao, M. V. V. S.; Meyyappan, Meyya

    2000-01-01

    In order to meet NASA's requirements for the rapid development and validation of future generation electronic devices as well as associated materials and processes, enabling technologies are being developed at NASA-Ames Research Center using a multi-discipline approach. The first step is to understand the basic physics of the chemical reactions in the area of plasma reactors and processes. Low pressure glow discharges are indispensable in the fabrication of microelectronic circuits. These plasmas are used to deposit materials and also etch fine features in device fabrication. However, many plasma-based processes suffer from stability and reliability problems leading to a compromise in performance and a potentially increased cost for the semiconductor manufacturing industry. Although a great deal of laboratory-scale research has been performed on many of these processing plasmas, little is known about the gas-phase and surface chemical reactions that are critical in many etch and deposition processes, and how these reactions are influenced by the variation in operating conditions. Such a lack of understanding has hindered the development of process models that can aid in the scaling and improvement of plasma etch and deposition systems. Our present research involves the study of such plasmas. An inductively-coupled plasma (ICP) source in place of the standard upper electrode assembly of the Gaseous Electronics Conference (GEC) radio-frequency (RF) Reference Cell is used to investigate the discharge characteristics. This ICP source generates plasmas with higher electron densities and lower operating pressures than obtainable with the original parallel-plate version of the GEC Cell. This expanded operating regime is more relevant to new generations of industrial plasma systems being used by the microelectronics industry. The research goal is to develop an understanding of the physical phenomena involved in plasma processing and to measure much needed fundamental parameters, such as gas phase and surface reaction rates, species concentration, temperature, ion energy distribution, and electron number density.

  1. 44 CFR 361.8 - Ineligible expenditures.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... for the purchase or rental of any equipment such as radio/telephone communications equipment, warning systems, and computers and other related information processing equipment, except as stated in § 361.7(b...

  2. 44 CFR 361.8 - Ineligible expenditures.

    Code of Federal Regulations, 2013 CFR

    2013-10-01

    ... for the purchase or rental of any equipment such as radio/telephone communications equipment, warning systems, and computers and other related information processing equipment, except as stated in § 361.7(b...

  3. 44 CFR 361.8 - Ineligible expenditures.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... for the purchase or rental of any equipment such as radio/telephone communications equipment, warning systems, and computers and other related information processing equipment, except as stated in § 361.7(b...

  4. 44 CFR 361.8 - Ineligible expenditures.

    Code of Federal Regulations, 2014 CFR

    2014-10-01

    ... for the purchase or rental of any equipment such as radio/telephone communications equipment, warning systems, and computers and other related information processing equipment, except as stated in § 361.7(b...

  5. 44 CFR 361.8 - Ineligible expenditures.

    Code of Federal Regulations, 2012 CFR

    2012-10-01

    ... for the purchase or rental of any equipment such as radio/telephone communications equipment, warning systems, and computers and other related information processing equipment, except as stated in § 361.7(b...

  6. Plasma-based water purification: Challenges and prospects for the future

    NASA Astrophysics Data System (ADS)

    Foster, John E.

    2017-05-01

    Freshwater scarcity derived from seasonal weather variations, climate change, and over-development has led to serious consideration for water reuse. Water reuse involves the direct processing of wastewater for either indirect or directly potable water reuse. In either case, advanced water treatment technologies will be required to process the water to the point that it can be reused in a meaningful way. Additionally, there is growing concern regarding micropollutants, such as pharmaceuticals and personal care products, which have been detected in finished drinking water not removed by conventional means. The health impact of these contaminants in low concentration is not well understood. Pending regulatory action, the removal of these contaminants by water treatment plants will also require advanced technology. One new and emerging technology that could potentially address the removal of micropollutants in both finished drinking water as well as wastewater slated for reuse is plasma-based water purification. Plasma in contact with liquid water generates a host of reactive species that attack and ultimately mineralize contaminants in solution. This interaction takes place in the boundary layer or interaction zone centered at the plasma-liquid water interface. An understanding of the physical processes taking place at the interface, though poorly understood, is key to the optimization of plasma-based water purifiers. High electric field conditions, large density gradients, plasma-driven chemistries, and fluid dynamic effects prevail in this multiphase region. The region is also the source function for longer-lived reactive species that ultimately treat the water. Here, we review the need for advanced water treatment methods and in the process, make the case for plasma-based methods. Additionally, we survey the basic methods of interacting plasma with liquid water (including a discussion of breakdown processes in water), the current state of understanding of the physical processes taking place at the plasma-liquid interface, and the role these processes play in water purification. The development of plasma diagnostics usable in this multiphase environment along with modeling efforts aimed at elucidating physical processes taking place at the interface are also detailed. Key experiments that demonstrate the capability of plasma-based water treatment are also reviewed. The technical challenges to the implementation of plasma-based water reactors are also discussed. We conclude with a discussion of prospects for the future of plasma-based water purification.

  7. Studies of RF sheaths and diagnostics on IShTAR

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Crombé, K., E-mail: Kristel.Crombe@UGent.be; LPP-ERM/KMS, Royal Military Academy, Brussels; Devaux, S.

    2015-12-10

    IShTAR (Ion cyclotron Sheath Test ARrangement) is a linear magnetised plasma test facility for RF sheaths studies at the Max-Planck-Institut für Plasmaphysik in Garching. In contrast to a tokamak, a test stand provides more liberty to impose the parameters and gives better access for the instrumentation and antennas. The project will support the development of diagnostic methods for characterising RF sheaths and validate and improve theoretical predictions. The cylindrical vacuum vessel has a diameter of 1 m and is 1.1 m long. The plasma is created by an external cylindrical plasma source equipped with a helical antenna that has been designed tomore » excite the m=1 helicon mode. In inductive mode, plasma densities and electron temperatures have been characterised with a planar Langmuir probe as a function of gas pressure and input RF power. A 2D array of RF compensated Langmuir probes and a spectrometer are planned. A single strap RF antenna has been designed; the plasma-facing surface is aligned to the cylindrical plasma to ease the modelling. The probes will allow direct measurements of plasma density profiles in front of the RF antenna, and thus a detailed study of the density modifications induced by RF sheaths, which influences the coupling. The RF antenna frequency has been chosen to study different plasma wave interactions: the accessible plasma density range includes an evanescent and propagative behaviour of slow or fast waves, and allows the study of the effect of the lower hybrid resonance layer.« less

  8. 48 CFR 52.234-1 - Industrial Resources Developed Under Defense Production Act Title III.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... materials, services, processes, or manufacturing equipment (including the processes, technologies, and ancillary services for the use of such equipment) established or maintained under the authority of Title III...

  9. A Survey of Plasmas and Their Applications

    NASA Technical Reports Server (NTRS)

    Eastman, Timothy E.; Grabbe, C. (Editor)

    2006-01-01

    Plasmas are everywhere and relevant to everyone. We bath in a sea of photons, quanta of electromagnetic radiation, whose sources (natural and artificial) are dominantly plasma-based (stars, fluorescent lights, arc lamps.. .). Plasma surface modification and materials processing contribute increasingly to a wide array of modern artifacts; e.g., tiny plasma discharge elements constitute the pixel arrays of plasma televisions and plasma processing provides roughly one-third of the steps to produce semiconductors, essential elements of our networking and computing infrastructure. Finally, plasmas are central to many cutting edge technologies with high potential (compact high-energy particle accelerators; plasma-enhanced waste processors; high tolerance surface preparation and multifuel preprocessors for transportation systems; fusion for energy production).

  10. Physical processes associated with current collection by plasma contactors

    NASA Technical Reports Server (NTRS)

    Katz, Ira; Davis, Victoria A.

    1990-01-01

    Recent flight data confirms laboratory observations that the release of neutral gas increases plasma sheath currents. Plasma contactors are devices which release a partially ionized gas in order to enhance the current flow between a spacecraft and the space plasma. Ionization of the expellant gas and the formation of a double layer between the anode plasma and the space plasma are the dominant physical processes. A theory is presented of the interaction between the contactor plasma and the background plasma. The conditions for formation of a double layer between the two plasmas are derived. Double layer formation is shown to be a consequence of the nonlinear response of the plasmas to changes in potential. Numerical calculations based upon this model are compared with laboratory measurements of current collection by hollow cathode-based plasma contactors.

  11. 7 CFR 4284.924 - Ineligible uses of grant and matching funds.

    Code of Federal Regulations, 2013 CFR

    2013-01-01

    ... or facility (including a processing facility); (d) Purchase, lease purchase, or install fixed equipment, including processing equipment; (e) Purchase or repair vehicles, including boats; (f) Pay for the... processing and marketing of the value-added product; (h) Fund research and development; (i) Fund political or...

  12. 7 CFR 4284.924 - Ineligible uses of grant and matching funds.

    Code of Federal Regulations, 2014 CFR

    2014-01-01

    ... or facility (including a processing facility); (d) Purchase, lease purchase, or install fixed equipment, including processing equipment; (e) Purchase or repair vehicles, including boats; (f) Pay for the... processing and marketing of the value-added product; (h) Fund research and development; (i) Fund political or...

  13. 7 CFR 4284.924 - Ineligible uses of grant and matching funds.

    Code of Federal Regulations, 2012 CFR

    2012-01-01

    ... or facility (including a processing facility); (d) Purchase, lease purchase, or install fixed equipment, including processing equipment; (e) Purchase or repair vehicles, including boats; (f) Pay for the... processing and marketing of the value-added product; (h) Fund research and development; (i) Fund political or...

  14. EQUIPMENT LAYOUT OF MAIN PROCESSING BUILDING (CPP601) LCELL PLAN AND ...

    Library of Congress Historic Buildings Survey, Historic Engineering Record, Historic Landscapes Survey

    EQUIPMENT LAYOUT OF MAIN PROCESSING BUILDING (CPP-601) L-CELL PLAN AND SECTION SHOWS COMPLEXITY OF CELLS. INL DRAWING NUMBER 200-0601-00-098-105687. ALTERNATE ID NUMBER 4289-20-301. - Idaho National Engineering Laboratory, Idaho Chemical Processing Plant, Fuel Reprocessing Complex, Scoville, Butte County, ID

  15. Atomic precision etch using a low-electron temperature plasma

    NASA Astrophysics Data System (ADS)

    Dorf, L.; Wang, J.-C.; Rauf, S.; Zhang, Y.; Agarwal, A.; Kenney, J.; Ramaswamy, K.; Collins, K.

    2016-03-01

    Sub-nm precision is increasingly being required of many critical plasma etching processes in the semiconductor industry. Accurate control over ion energy and ion/radical composition is needed during plasma processing to meet these stringent requirements. Described in this work is a new plasma etch system which has been designed with the requirements of atomic precision plasma processing in mind. In this system, an electron sheet beam parallel to the substrate surface produces a plasma with an order of magnitude lower electron temperature Te (~ 0.3 eV) and ion energy Ei (< 3 eV without applied bias) compared to conventional radio-frequency (RF) plasma technologies. Electron beam plasmas are characterized by higher ion-to-radical fraction compared to RF plasmas, so a separate radical source is used to provide accurate control over relative ion and radical concentrations. Another important element in this plasma system is low frequency RF bias capability which allows control of ion energy in the 2-50 eV range. Presented in this work are the results of etching of a variety of materials and structures performed in this system. In addition to high selectivity and low controllable etch rate, an important requirement of atomic precision etch processes is no (or minimal) damage to the remaining material surface. It has traditionally not been possible to avoid damage in RF plasma processing systems, even during atomic layer etch. The experiments for Si etch in Cl2 based plasmas in the aforementioned etch system show that damage can be minimized if the ion energy is kept below 10 eV. Layer-by-layer etch of Si is also demonstrated in this etch system using electrical and gas pulsing.

  16. Use of Atmospheric-Pressure Plasma Jet for Polymer Surface Modification: An Overview

    DOE Office of Scientific and Technical Information (OSTI.GOV)

    Kuettner, Lindsey A.

    Atmospheric-pressure plasma jets (APPJs) are playing an increasingly important role in materials processing procedures. Plasma treatment is a useful tool to modify surface properties of materials, especially polymers. Plasma reacts with polymer surfaces in numerous ways thus the type of process gas and plasma conditions must be explored for chosen substrates and materials to maximize desired properties. This report discusses plasma treatments and looks further into atmospheric-pressure plasma jets and the effects of gases and plasma conditions. Following the short literature review, a general overview of the future work and research at Los Alamos National Laboratory (LANL) is discussed.

  17. Mirror-field confined compact plasma source using permanent magnet for plasma processings.

    PubMed

    Goto, Tetsuya; Sato, Kei-Ichiro; Yabuta, Yuki; Sugawa, Shigetoshi

    2016-12-01

    A mirror-field confined compact electron cyclotron resonance (ECR) plasma source using permanent magnets was developed, aiming for the realization of high-quality plasma processings where high-density reactive species are supplied to a substrate with minimizing the ion bombardment damages. The ECR position was located between a microwave transmissive window and a quartz limiter, and plasmas were transported from the ECR position to a midplane of the magnetic mirror field through the quartz limiter. Thus, a radius of core plasma could be determined by the limiter, which was 15 mm in this study. Plasma parameters were investigated by the Langmuir probe measurement. High-density plasma larger than 10 11 cm -3 could be produced by applying 5.85-GHz microwave power of 10 W or more. For the outside region of the core plasma where a wafer for plasma processings will be set at, the ion current density was decreased dramatically with distance from the core plasma and became smaller by approximately two orders of magnitude that in the core plasma region for the radial position of 40 mm, suggesting the realization of reduction in ion bombardment damages.

  18. Plasma-water interactions at atmospheric pressure in a dc microplasma

    NASA Astrophysics Data System (ADS)

    Patel, Jenish; Němcová, Lucie; Mitra, Somak; Graham, William; Maguire, Paul; Švrček, Vladimir; Mariotti, Davide

    2013-09-01

    Plasma-liquid interactions generate a variety of chemical species that are very useful for the treatment of many materials and that makes plasma-induced liquid chemistry (PiLC) very attractive for industrial applications. The understanding of plasma-induced chemistry with water can open up a vast range of plasma-activated chemistry in liquid with enormous potential for the synthesis of chemical compounds, nanomaterials synthesis and functionalization. However, this basic understanding of the chemistry occurring at the plasma-liquid interface is still poor. In the present study, different properties of water are analysed when processed by plasma at atmospheric-pressure with different conditions. In particular, pH, temperature and conductivity of water are measured against current and time of plasma processing. We also observed the formation of molecular oxygen (O2) and hydrogen peroxide (H2O2) for the same plasma conditions. The current of plasma processing was found to affect the water properties and the production of hydrogen peroxide in water. The relation between the number of electrons injected from plasma in water and the number of H2O2 molecules was established and based on these results a scenario of reactions channels activated by plasma-water interface is concluded.

  19. Real-Time Fault Classification for Plasma Processes

    PubMed Central

    Yang, Ryan; Chen, Rongshun

    2011-01-01

    Plasma process tools, which usually cost several millions of US dollars, are often used in the semiconductor fabrication etching process. If the plasma process is halted due to some process fault, the productivity will be reduced and the cost will increase. In order to maximize the product/wafer yield and tool productivity, a timely and effective fault process detection is required in a plasma reactor. The classification of fault events can help the users to quickly identify fault processes, and thus can save downtime of the plasma tool. In this work, optical emission spectroscopy (OES) is employed as the metrology sensor for in-situ process monitoring. Splitting into twelve different match rates by spectrum bands, the matching rate indicator in our previous work (Yang, R.; Chen, R.S. Sensors 2010, 10, 5703–5723) is used to detect the fault process. Based on the match data, a real-time classification of plasma faults is achieved by a novel method, developed in this study. Experiments were conducted to validate the novel fault classification. From the experimental results, we may conclude that the proposed method is feasible inasmuch that the overall accuracy rate of the classification for fault event shifts is 27 out of 28 or about 96.4% in success. PMID:22164001

  20. Treatment of Second-Order Structures of Proteins Using Oxygen Radio Frequency Plasma

    NASA Astrophysics Data System (ADS)

    Hayashi, Nobuya; Nakahigashi, Akari; Liu, Hao; Goto, Masaaki

    2010-08-01

    Decomposition characteristics of second-order structures of proteins are determined using an oxygen radio frequency (RF) plasma sterilizer in order to prevent infectious proteins from contaminating medical equipment in hospitals. The removal of casein protein as a test protein with a concentration of 50 mg/cm2 on the plane substrate requires approximately 8 h when singlet atomic oxygen is irradiated. The peak intensity of Fourier transform infrared spectroscopy (FTIR) spectra of the β-sheet structures decreases at approximately the same rate as those of the α-helix and first-order structures of proteins. Active oxygen has a sufficient oxidation energy to dissociate hydrogen bonds within the β-sheet structure.

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