Plasma surface cleaning in a microwave plasma source
DOE Office of Scientific and Technical Information (OSTI.GOV)
Tsai, C.C.; Nelson, W.D.; Haselton, H.H.
1994-03-01
A microwave electron cyclotron resonance (ECR) plasma source has been operated to produce reactive plasmas of oxygen and its mixture with argon. Aluminum samples (0.95 cm by 1.9 cm) were coated with thin films (<20 {mu}m in thickness) of Shell Vitrea oil and cleaned by using such reactive plasmas. The plasma cleaning was done in discharge conditions of microwave power up to 1300 W, radio frequency power up to 200 W, biased potential up to 400 V, gas pressures up to 5 mtorr, and operating time up to 35 min. The surface texture of the postcleaned samples has been examinedmore » visually. Mass loss of the samples after plasma cleaning was measured to estimate cleaning rates. Measured clean rates of low-pressure (0.5-mtorr) argon/oxygen plasmas were as high as 2.7 {mu}m/min. X-ray photoelectron spectroscopy (XPS) was used to determine cleanliness of the sample surfaces after plasma cleaning. The XPS study on polished samples confirmed the effectiveness of plasma cleaning in achieving atomic level of surface cleanliness. In this technical memorandum plasma properties, cleaning phenomena, and significant results are reported and discussed.« less
Plasma surface cleaning using microwave plasmas
DOE Office of Scientific and Technical Information (OSTI.GOV)
Tsai, C.C.; Haselton, H.H.; Nelson, W.D.
1993-11-01
In a microwave electron cyclotron resonance (ECR) plasma source, reactive plasmas of oxygen and its mixture with argon are used for plasma-cleaning experiments. Aluminum test samples (0.95 {times} 1.9 cm) were coated with thin films ({le} 20 {mu}m in thickness) of Shell Vitrea oil and cleaned by using such reactive plasmas. The plasma cleaning was done in various discharge conditions with fixed microwave power, rf power, biased potential, gas pressures (0.5 and 5 mtorr), and operating time up to 35 min. The status of plasma cleaning has been monitored by using mass spectroscopy. Mass loss of the samples after plasmamore » cleaning was measured to estimate cleaning rates. Measured clean rates of low pressure (0.5 mtorr) argon/oxygen plasmas were as high as 2.7 {mu}/min. X-ray photoelectron spectroscopy was used to determine cleanliness of the sample surfaces and confirm the effectiveness of plasma cleaning in achieving atomic levels of surface cleanliness. In this paper, significant results are reported and discussed.« less
Efficiency of surface cleaning by a glow discharge for plasma spraying coating
NASA Astrophysics Data System (ADS)
Kadyrmetov, A. M.; Kashapov, N. F.; Sharifullin, S. N.; Saifutdinov, A. I.; Fadeev, S. A.
2016-06-01
The article presents the results of experimental studies of the quality of cleaning steel surfaces by a glow discharge for plasma spraying. Shows the results of measurements of the angle of surface wetting and bond strength of the plasma coating to the surface treated. The dependence of the influence of the glow discharge power, chamber pressure, distance between the electrodes and the processing time of the surface on cleaning efficiency. Optimal fields of factors is found. It is shown increase joint strength coating and base by 30-80% as a result of cleaning the substrate surface by a glow discharge plasma spraying.
Comparative study between chemical and atmospheric pressure plasma jet cleaning on glass substrate
NASA Astrophysics Data System (ADS)
Elfa, Rizan Rizon; Ahmad, Mohd Khairul; Fhong, Soon Chin; Sahdan, Mohd Zainizan; Nayan, Nafarizal
2017-01-01
The atmospheric pressure plasma jet with low frequency and argon as working gas is presented in this paper to demonstrate its application for glass substrate clean and modification. The glass substrate clean by atmospheric pressure plasma jet is an efficient method to replace other substrate clean method. A comparative analysis is done in this paper between substrate cleaned by chemical and plasma treatment methods. Water contact angle reading is taken for a different method of substrate clean and period of treatment. Under the plasma treatment, the sample shows low surface adhesion due to having the surface property of super hydrophilic surface 7.26°. This comparative analysis is necessary in the industrial application for cost production due to sufficient time and method of substrate clean.
NASA Technical Reports Server (NTRS)
Shannon, R. L.; Gillette, R. B.
1974-01-01
The technique which utilizes exposure to a plasma to remove contaminants from a surface was incorporated into a laboratory model which demonstrates active cleaning by both plasma cleaning and ion sputtering modes of operation. The development phase is reported and includes discussion of the plasma tube configuration, device design, and performance tests. A general description of the active cleaning device is provided which includes information on the main power/plasma discharge sensors, and the power, gas supply, and ion accelerator systems. Development of the active cleaning species at high vacuum conditions is described and results indicate that plasma cleaning occurs in the region of a visible plume which extends from the end of the plasma tube. Recommendations are made for research to determine the plasma cleaning mechanism and the plasma species responsible for the cleaning, as well limitations on the type of contaminants that can be removed.
Surface cleaning and pure nitridation of GaSb by in-situ plasma processing
NASA Astrophysics Data System (ADS)
Gotow, Takahiro; Fujikawa, Sachie; Fujishiro, Hiroki I.; Ogura, Mutsuo; Chang, Wen Hsin; Yasuda, Tetsuji; Maeda, Tatsuro
2017-10-01
A clean and flat GaSb surface without native oxides has been attained by H2 plasma cleaning and subsequent in-situ N2 plasma nitridation process at 300 oC. The mechanisms of thermal desorption behavior of native oxides on GaSb have been studied by thermal desorption spectroscopy (TDS) analysis. The suitable heat treatment process window for preparing a clean GaSb surface is given. Auger electron spectroscopy (AES) analysis indicates that native oxides were completely removed on the GaSb surface after H2 plasma exposure and the pure nitridation of the clean GaSb surface was obtained at a relatively low temperature of 300 °C. This pure nitridation of GaSb have a possibility to be used as a passivation layer for high quality GaSb MOS devices.
Surface oxidation of GaN(0001): Nitrogen plasma-assisted cleaning for ultrahigh vacuum applications
DOE Office of Scientific and Technical Information (OSTI.GOV)
Gangopadhyay, Subhashis; Schmidt, Thomas, E-mail: tschmidt@ifp.uni-bremen.de; Kruse, Carsten
The cleaning of metal-organic vapor-phase epitaxial GaN(0001) template layers grown on sapphire has been investigated. Different procedures, performed under ultrahigh vacuum conditions, including degassing and exposure to active nitrogen from a radio frequency nitrogen plasma source have been compared. For this purpose, x-ray photoelectron spectroscopy, reflection high-energy electron diffraction, and scanning tunneling microscopy have been employed in order to assess chemical as well as structural and morphological surface properties. Initial degassing at 600 °C under ultrahigh vacuum conditions only partially eliminates the surface contaminants. In contrast to plasma assisted nitrogen cleaning at temperatures as low as 300 °C, active-nitrogen exposure at temperaturesmore » as high as 700 °C removes the majority of oxide species from the surface. However, extended high-temperature active-nitrogen cleaning leads to severe surface roughening. Optimum results regarding both the removal of surface oxides as well as the surface structural and morphological quality have been achieved for a combination of initial low-temperature plasma-assisted cleaning, followed by a rapid nitrogen plasma-assisted cleaning at high temperature.« less
Active cleaning technique for removing contamination from optical surfaces in space
NASA Technical Reports Server (NTRS)
Shannon, R. L.; Gillette, R. B.; Cruz, G. A.
1973-01-01
An active cleaning technique for removing contaminants from optical surfaces in space was investigated with emphasis on the feasibility of using plasma exposure as a means of in-situ cleaning. The major work accomplished includes: (1) development of an in-situ reflectometer for use in conjunction with the contaminant film deposition/cleaning facility; (2) completion of Apollo Telescope Mount (ATM) filter treatment experiments to assess the effects of plasma exposure on the UV transmittance; (3) attempts to correlate the atomic oxygen flux with cleaning rate; (4) completion of in-situ butadien contamination/plasma cleaning/UV reflectance measurement experiments; (5) carbon cleaning experiments using various gases; (6) completion of silicone contamination/cleaning experiments; and (7) experiments conducted at low chamber pressures to determine cleaning rate distribution and contamination of surfaces adjacent to those being cleaned.
Plasma discharge self-cleaning filtration system
Cho, Young I.; Fridman, Alexander; Gutsol, Alexander F.; Yang, Yong
2014-07-22
The present invention is directed to a novel method for cleaning a filter surface using a plasma discharge self-cleaning filtration system. The method involves utilizing plasma discharges to induce short electric pulses of nanoseconds duration at high voltages. These electrical pulses generate strong Shockwaves that disintegrate and dislodge particulate matter located on the surface of the filter.
Plasma cleaning of nanoparticles from EUV mask materials by electrostatics
NASA Astrophysics Data System (ADS)
Lytle, W. M.; Raju, R.; Shin, H.; Das, C.; Neumann, M. J.; Ruzic, D. N.
2008-03-01
Particle contamination on surfaces used in extreme ultraviolet (EUV) mask blank deposition, mask fabrication, and patterned mask handling must be avoided since the contamination can create significant distortions and loss of reflectivity. Particles on the order of 10nm are problematic during MLM mirror fabrication, since the introduced defects disrupt the local Bragg planes. The most serious problem is the accumulation of particles on surfaces of patterned blanks during EUV light exposure, since > 25nm particles will be printed without an out-of-focus pellicle. Particle contaminants are also a problem with direct imprint processes since defects are printed every time. Plasma Assisted Cleaning by Electrostatics (PACE) works by utilizing a helicon plasma as well as a pulsed DC substrate bias to charge particle and repel them electrostatically from the surface. Removal of this nature is a dry cleaning method and removes contamination perpendicular from the surface instead of rolling or sweeping the particles off the surface, a benefit when cleaning patterned surfaces where contamination can be rolled or trapped between features. Also, an entire mask can be cleaned at once since the plasma can cover the entire surface, thus there is no need to focus in on an area to clean. Sophisticated particle contamination detection system utilizing high power laser called DEFCON is developed to analyze the particle removal after PACE cleaning process. PACE has shown greater than 90 % particle removal efficiencies for 30 to 220 nm PSL particles on ruthenium capped quartz. Removal results for silicon surfaces and quartz surfaces show similar removal efficiencies. Results of cleaning 80 nm PSL spheres from silicon substrates will be shown.
Cleaning of titanium substrates after application in a bioreactor.
Fingerle, Mathias; Köhler, Oliver; Rösch, Christina; Kratz, Fabian; Scheibe, Christian; Davoudi, Neda; Müller-Renno, Christine; Ziegler, Christiane; Huster, Manuel; Schlegel, Christin; Ulber, Roland; Bohley, Martin; Aurich, Jan C
2015-03-10
Plain and microstructured cp-titanium samples were studied as possible biofilm reactor substrates. The biofilms were grown by exposition of the titanium samples to bacteria in a flow cell. As bacteria the rod shaped gram negative Pseudomonas fluorescens and the spherical gram negative Paracoccus seriniphilus were chosen. Afterward, the samples were cleaned in subsequent steps: First, with a standard solvent based cleaning procedure with acetone, isopropanol, and ultrapure water and second by oxygen plasma sputtering. It will be demonstrated by means of x-ray photoelectron spectroscopy, fluorescence microscopy, and confocal laser scanning microscopy that oxygen plasma cleaning is a necessary and reliant tool to fully clean and restore titanium surfaces contaminated with a biofilm. The microstructured surfaces act beneficial to biofilm growth, while still being fully restorable after biofilm contamination. Scanning electron microscopy images additionally show, that the plasma process does not affect the microstructures. The presented data show the importance of the cleaning procedure. Just using solvents does not remove the biofilm and all its components reliably while a cleaning process by oxygen plasma regenerates the surfaces.
Method for atmospheric pressure reactive atom plasma processing for surface modification
Carr, Jeffrey W [Livermore, CA
2009-09-22
Reactive atom plasma processing can be used to shape, polish, planarize and clean the surfaces of difficult materials with minimal subsurface damage. The apparatus and methods use a plasma torch, such as a conventional ICP torch. The workpiece and plasma torch are moved with respect to each other, whether by translating and/or rotating the workpiece, the plasma, or both. The plasma discharge from the torch can be used to shape, planarize, polish, and/or clean the surface of the workpiece, as well as to thin the workpiece. The processing may cause minimal or no damage to the workpiece underneath the surface, and may involve removing material from the surface of the workpiece.
Surface electronic states of low-temperature H-plasma-exposed Ge(100)
NASA Astrophysics Data System (ADS)
Cho, Jaewon; Nemanich, R. J.
1992-11-01
The surface of low-temperature H-plasma-cleaned Ge(100) was studied by angle-resolved UV-photoemission spectroscopy and low-energy electron diffraction (LEED). The surface was prepared by an ex situ preclean followed by an in situ H-plasma exposure at a substrate temperature of 150-300 °C. Auger-electron spectroscopy indicated that the in situ H-plasma clean removed the surface contaminants (carbon and oxygen) from the Ge(100) surface. The LEED pattern varied from a 1×1 to a sharp 2×1, as the substrate temperature was increased. The H-induced surface state was identified at ~5.6 eV below EF, which was believed to be mainly due to the ordered or disordered monohydride phases. The annealing dependence of the spectra showed that the hydride started to dissociate at a temperature of 190 °C, and the dangling-bond surface state was identified. A spectral shift upon annealing indicated that the H-terminated surfaces were unpinned. After the H-plasma clean at 300 °C the dangling-bond surface state was also observed directly with no evidence of H-induced states.
Particulate contamination removal from wafers using plasmas and mechanical agitation
Selwyn, G.S.
1998-12-15
Particulate contamination removal from wafers is disclosed using plasmas and mechanical agitation. The present invention includes the use of plasmas with mechanical agitation for removing particulate matter from the surface of a wafer. The apparatus hereof comprises a mechanical activator, at least one conducting contact pin for transferring the vibration from the activator to the wafer, clamp fingers that maintain the wafer`s position, and means for generating a plasma in the vicinity of the surface of the wafer, all parts of the cleaning apparatus except the mechanical activator and part of the contact pin being contained inside the processing chamber. By exposing a wafer to a plasma and providing motion thereto in a direction perpendicular to its surface, the bonding between the particulate matter and the surface may be overcome. Once free of the wafer surface, the particulates become charged by electrons from the plasma and are drawn into the plasma by attractive forces which keep them from redepositing. The introduction of a flowing gas through the plasma sweeps the particulates away from the wafer and out of the plasma. The entire surface is cleaned during one cleaning step. The use of an rf plasma to accomplish the particulate removal was found to remove more than 90% of the particulates. 4 figs.
Particulate contamination removal from wafers using plasmas and mechanical agitation
Selwyn, Gary S.
1998-01-01
Particulate contamination removal from wafers using plasmas and mechanical agitation. The present invention includes the use of plasmas with mechanical agitation for removing particulate matter from the surface of a wafer. The apparatus hereof comprises a mechanical activator, at least one conducting contact pin for transferring the vibration from the activator to the wafer, clamp fingers that maintain the wafer's position, and means for generating a plasma in the vicinity of the surface of the wafer, all parts of the cleaning apparatus except the mechanical activator and part of the contact pin being contained inside the processing chamber. By exposing a wafer to a plasma and providing motion thereto in a direction perpendicular to its surface, the bonding between the particulate matter and the surface may be overcome. Once free of the wafer surface, the particulates become charged by electrons from the plasma and are drawn into the plasma by attractive forces which keep them from redepositing. The introduction of a flowing gas through the plasma sweeps the particulates away from the wafer and out of the plasma. The entire surface is cleaned during one cleaning step. The use of an rf plasma to accomplish the particulate removal was found to remove more than 90% of the particulates.
Active cleaning technique device
NASA Technical Reports Server (NTRS)
Shannon, R. L.; Gillette, R. B.
1973-01-01
The objective of this program was to develop a laboratory demonstration model of an active cleaning technique (ACT) device. The principle of this device is based primarily on the technique for removing contaminants from optical surfaces. This active cleaning technique involves exposing contaminated surfaces to a plasma containing atomic oxygen or combinations of other reactive gases. The ACT device laboratory demonstration model incorporates, in addition to plasma cleaning, the means to operate the device as an ion source for sputtering experiments. The overall ACT device includes a plasma generation tube, an ion accelerator, a gas supply system, a RF power supply and a high voltage dc power supply.
In situ oxygen plasma cleaning of microswitch surfaces—comparison of Ti and graphite electrodes
NASA Astrophysics Data System (ADS)
Oh, Changho; Streller, Frank; Ashurst, W. Robert; Carpick, Robert W.; de Boer, Maarten P.
2016-11-01
Ohmic micro- and nanoswitches are of interest for a wide variety of applications including radio frequency communications and as low power complements to transistors. In these switches, it is of paramount importance to maintain surface cleanliness in order to prevent frequent failure by tribopolymer growth. To prepare surfaces, an oxygen plasma clean is expected to be beneficial compared to a high temperature vacuum bakeout because of shorter cleaning time (<5 min compared to ~24 h) and active removal of organic contaminants. We demonstrate that sputtering of the electrode material during oxygen plasma cleaning is a critical consideration for effective cleaning of switch surfaces. With Ti electrodes, a TiO x layer forms that increases electrical contact resistance. When plasma-cleaned using graphite electrodes, the resistance of Pt-coated microswitches exhibit a long lifetime with consistently low resistance (<0.5 Ω variation over 300 million cycles) if the test chamber is refilled with ultra-high purity nitrogen and if the devices are not exposed to laboratory air. Their current-voltage characteristic is also linear at the millivolt level. This is important for nanoswitches which will be operated in that range.
Surface Structure and Surface Electronic States Related to Plasma Cleaning of Silicon and Germanium
NASA Astrophysics Data System (ADS)
Cho, Jaewon
This thesis discusses the surface structure and the surface electronic states of Si and Ge(100) surfaces as well as the effects of oxidation process on the silicon oxide/Si(100) interface structure. The H-plasma exposure was performed in situ at low temperatures. The active species, produced in the H-plasma by the rf-excitation of H_2 gas, not only remove microcontaminants such as oxygen and carbon from the surface, but also passivate the surface with atomic hydrogen by satisfying the dangling bonds of the surface atoms. The surfaces were characterized by Angle Resolved UV-Photoemission Spectroscopy (ARUPS) and Low Energy Electron Diffraction (LEED). In the case of Si(100), H-plasma exposure produced ordered H-terminated crystallographic structures with either a 2 x 1 or 1 x 1 LEED pattern. The hydride phases, found on the surfaces of the cleaned Si(100), were shown to depend on the temperature of the surface during H-plasma cleaning. The electronic states for the monohydride and dihydride phases were identified by ARUPS. When the plasma cleaned surface was annealed, the phase transition from the dihydride to monohydride was observed. The monohydride Si-H surface bond was stable up to 460^circC, and the dangling bond surface states were identified after annealing at 500^circC which was accompanied by the spectral shift. The H-terminated surface were characterized to have a flat band structure. For the Ge(100) surface, an ordered 2 x 1 monohydride phase was obtained from the surface cleaned at 180 ^circC. After plasma exposure at <=170^circC a 1 x 1 surface was observed, but the ARUPS indicated that the surface was predominantly composed of disordered monohydride structures. After annealing above the H-dissociation temperatures, the shift in the spectrum was shown to occur with the dangling bond surface states. The H-terminated surfaces were identified to be unpinned. The interface structure of silicon oxide/Si(100) was studied using ARUPS. Spectral shifts were observed, which were dependent on the processes of surface preparation and oxidation. The shift was characterized in association with the band bending. The origins of the spectral shifts were discussed, including defects at interface and H-passivation in Si. The interface structure is considered to be dependent on the surface preparation and oxidation process.
Tuning the adhesion between polyimide substrate and MWCNTs/epoxy nanocomposite by surface treatment
NASA Astrophysics Data System (ADS)
Bouhamed, Ayda; Kia, Alireza Mohammadian; Naifar, Slim; Dzhagan, Volodymyr; Müller, Christian; Zahn, Dietrich R. T.; Choura, Slim; Kanoun, Olfa
2017-11-01
MWCNTs/epoxy nanocomposite thin films are coated on the polyimide (PI) flexible substrate, to be used as a strain sensor. Previous studies showed that the adhesion between polyimide and other materials are very poor. In this work, two approaches, oxygen plasma cleaning and simple solvent cleaning are performed for activation of the polyimide surface. In order to understand the impact of both cleaning techniques, the physicochemical properties of PI are measured and characterized using contact angle measurements (CAMs), X-ray photoelectron spectroscopy(XPS), and atomic force microscopy (AFM). In addition, the adhesion properties of PI/[MWCNTs/epoxy] systems by varying surface treatment time are investigated and evaluated using force-distance measurements by AFM. The results illustrate that the activated surface exhibits higher surface energy for oxygen plasma cleaning in comparison with the solvent cleaning method. The improvement can be related to the increase of oxygen concentration, which is accompanied by the enhancement of the polar component to 53.79 mN/m due to the formation of functional groups on the surface and the change of the substrate surface roughness from 1.72 nm to 15.5 nm. As a result, improved adhesion was observed from force-distance measurement between PI/[MWCNTs/epoxy] systems due to oxygen plasma effects.
Towards plasma cleaning of ITER first mirrors
NASA Astrophysics Data System (ADS)
Moser, L.; Marot, L.; Eren, B.; Steiner, R.; Mathys, D.; Leipold, F.; Reichle, R.; Meyer, E.
2015-06-01
To avoid reflectivity losses in ITER's optical diagnostic systems, on-site cleaning of metallic first mirrors via plasma sputtering is foreseen to remove deposit build-ups migrating from the main wall. In this work, the influence of aluminium and tungsten deposits on the reflectivity of molybdenum mirrors as well as the possibility to clean them with plasma exposure is investigated. Porous ITER-like deposits are grown to mimic the edge conditions expected in ITER, and a severe degradation in the specular reflectivity is observed as these deposits build up on the mirror surface. In addition, dense oxide films are produced for comparisons with porous films. The composition, morphology and crystal structure of several films were characterized by means of scanning electron microscopy, x-ray photoelectron spectroscopy, x-ray diffraction and secondary ion mass spectrometry. The cleaning of the deposits and the restoration of the mirrors' optical properties are possible either with a Kaufman source or radio frequency directly applied to the mirror (or radio frequency plasma generated directly around the mirror surface). Accelerating ions of an external plasma source through a direct current applied onto the mirror does not remove deposits composed of oxides. A possible implementation of plasma cleaning in ITER is addressed.
Large-Volume Resonant Microwave Discharge for Plasma Cleaning of a CEBAF 5-Cell SRF Cavity
DOE Office of Scientific and Technical Information (OSTI.GOV)
J. Mammosser, S. Ahmed, K. Macha, J. Upadhyay, M. Nikoli, S. Popovi, L. Vuakovi
2012-07-01
We report the preliminary results on plasma generation in a 5-cell CEBAF superconducting radio-frequency (SRF) cavity for the application of cavity interior surface cleaning. CEBAF currently has {approx}300 of these five cell cavities installed in the Jefferson Lab accelerator which are mostly limited by cavity surface contamination. The development of an in-situ cavity surface cleaning method utilizing a resonant microwave discharge could lead to significant CEBAF accelerator performance improvement. This microwave discharge is currently being used for the development of a set of plasma cleaning procedures targeted to the removal of various organic, metal and metal oxide impurities. These contaminantsmore » are responsible for the increase of surface resistance and the reduction of RF performance in installed cavities. The CEBAF five cell cavity volume is {approx} 0.5 m2, which places the discharge in the category of large-volume plasmas. CEBAF cavity has a cylindrical symmetry, but its elliptical shape and transversal power coupling makes it an unusual plasma application, which requires special consideration of microwave breakdown. Our preliminary study includes microwave breakdown and optical spectroscopy, which was used to define the operating pressure range and the rate of removal of organic impurities.« less
Saksø, H; Jakobsen, T; Saksø, M; Baas, J; Jakobsen, Ss; Soballe, K
2013-01-01
Implant surface treatments that improve early osseointegration may prove useful in long-term survival of uncemented implants. We investigated Acid Etching and Plasma Cleaning on titanium implants. In a randomized, paired animal study, four porous coated Ti implants were inserted into the femurs of each of ten dogs. PC (Porous Coating; control)PC+PSHA (Plasma Sprayed Hydroxyapatite; positive control)PC+ET (Acid Etch)PC+ET+PLCN (Plasma Cleaning) After four weeks mechanical fixation was evaluated by push-out test and osseointegration by histomorphometry. The PSHA-coated implants were better osseointegrated than the three other groups on outer surface implant porosity (p<0.05) while there was no statistical difference in deep surface implant porosity when compared with nontreated implant. Within the deep surface implant porosity, there was more newly formed bone in the control group compared to the ET and ET+PCLN groups (p<0.05). In all compared groups, there was no statistical difference in any biomechanical parameter. In terms of osseointegration on outer surface implant porosity PC+PSHA was superior to the other three groups. Neither the acid etching nor the plasma cleaning offered any advantage in terms of implant osseointegration. There was no statistical difference in any of the biomechanical parameters among all groups in the press-fit model at 4 weeks of evaluation time.
Collodion-reinforcement and plasma-cleaning of target foils
NASA Astrophysics Data System (ADS)
Stoner, John O.
2002-03-01
The preparation of evaporated target foils can often be facilitated by use of collodion coatings either on the substrate sides or on the exterior surfaces of the foils. Later, such coatings must usually be removed. Cleaning of a foil is necessary if thin layers of adhesives have crept onto the foil. Removal and/or cleaning can often be done satisfactorily with an oxygen plasma. Apparatus and procedures used for this are described. Foils that were cleaned successfully, and some that were incompatible with the cleaning process are listed.
In situ plasma removal of surface contaminants from ion trap electrodes
DOE Office of Scientific and Technical Information (OSTI.GOV)
Haltli, Raymond A.
2015-05-01
In this thesis, the construction and implementation of an in situ plasma discharge designed to remove surface contaminants from electrodes in an ion trapping experimental system is presented with results. In recent years, many advances have been made in using ion traps for quantum information processing. All of the criteria defined by DiVincenzo for using ion traps for implementing a quantum computer have been individually demonstrated, and in particular surface traps provide a scalable platform for ions. In order to be used for quantum algorithms, trapped ions need to be cooled to their motional (quantum mechanical) ground state. One ofmore » the hurdles in integrating surface ion traps for a quantum computer is minimizing electric field noise, which causes the ion to heat out of its motional ground state and which increases with smaller ion-to-electrode distances realized with surface traps. Surface contamination of trap electrodes is speculated to be the primary source of electric field noise. The main goal achieved by this work was to implement an in situ surface cleaning solution for surface electrode ion traps, which would not modify the ion trap electrode surface metal. Care was taken in applying the RF power in order to localize a plasma near the trap electrodes. A method for characterizing the energy of the plasma ions arriving at the ion trap surface is presented and results for plasma ion energies are shown. Finally, a method for quantifying the effectiveness of plasma cleaning of trap electrodes, using the surface analysis technique of X-ray photoelectron spectroscopy for measuring the amount and kind of surface contaminants, is described. A significant advantage of the trap electrode surface cleaning method presented here is the minimal changes necessary for implementation on a working ion trap experimental system.« less
Contact Activation of Blood Plasma and Factor XII by Ion-exchange Resins
Yeh, Chyi-Huey Josh; Dimachkie, Ziad O.; Golas, Avantika; Cheng, Alice; Parhi, Purnendu; Vogler, Erwin A.
2011-01-01
Sepharose ion-exchange particles bearing strong Lewis acid/base functional groups (sulfopropyl, carboxymethyl, quarternary ammonium, dimethyl aminoethyl, and iminodiacetic acid) exhibiting high plasma protein adsorbent capacities are shown to be more efficient activators of blood factor XII in neat-buffer solution than either hydrophilic clean-glass particles or hydrophobic octyl sepharose particles ( FXII→surfaceactivatorFXIIa; a.k.a autoactivation, where FXII is the zymogen and FXIIa is a procoagulant protease). In sharp contrast to the clean-glass standard of comparison, ion-exchange activators are shown to be inefficient activators of blood plasma coagulation. These contrasting activation properties are proposed to be due to the moderating effect of plasma-protein adsorption on plasma coagulation. Efficient adsorption of blood plasma proteins unrelated to the coagulation cascade impedes FXII contacts with ion-exchange particles immersed in plasma, reducing autoactivation, and causing sluggish plasma coagulation. By contrast, plasma proteins do not adsorb to hydrophilic clean glass and efficient autoactivation leads directly to efficient activation of plasma coagulation. It is also shown that competitive-protein adsorption can displace FXIIa adsorbed to the surface of ion-exchange resins. As a consequence of highly-efficient autoactivation and FXIIa displacement by plasma proteins, ion-exchange particles are slightly more efficient activators of plasma coagulation than hydrophobic octyl sepharose particles that do not bear strong Lewis acid/base surface functionalities but to which plasma proteins adsorb efficiently. Plasma proteins thus play a dual role in moderating contact activation of the plasma coagulation cascade. The principal role is impeding FXII contact with activating surfaces but this same effect can displace FXIIa from an activating surface into solution where the protease can potentiate subsequent steps of the plasma coagulation cascade. PMID:21982294
Repetitive cleaning of a stainless steel first mirror using radio frequency plasma
NASA Astrophysics Data System (ADS)
Peng, Jiao; Yan, Rong; Ding, Rui; Chen, Junling; Zhu, Dahuan; Zhang, Zengming
2017-10-01
First mirrors (FMs) are crucial components of optical diagnostic systems in present-day tokamaks and future fusion reactors. Their lifetimes should be extremely limited due to their proximity to burning plasma, greatly influencing the safe operation of corresponding diagnostics. Repetitive cleaning is expected to provide a solution to the frequent replacement of contaminated FMs, thus prolonging their lifetimes. Three repetitive cleaning cycles using radio frequency plasma were applied to stainless steel (SS) FM samples, to evaluate the change of the mirrors’ optical properties and morphology during each cycle. Amorphous carbon films were deposited on mirror surfaces under identical conditions in three cycles. In three cycles with identical cleaning parameters, the total reflectivity was restored at up to 95%. Nevertheless, with successive cleaning cycles, the FM surfaces gradually appeared to roughen due to damage to the grain boundaries. Correspondingly, the diffuse reflectivity increased from a few percent to 20% and 27% after the second and third cycles. After optimizing the cleaning parameters of the second and third cycles, the roughness showed a significant decrease, and simultaneously the increase of diffuse reflectivity was remarkably improved.
NASA Astrophysics Data System (ADS)
Ueda, Hirokazu; Ventzek, Peter L. G.; Oka, Masahiro; Kobayashi, Yuuki; Sugimoto, Yasuhiro
2015-06-01
Topographic structures such as Fin FETs and silicon nanowires for advanced gate fabrication require ultra-shallow high dose infusion of dopants into the silicon subsurface. Plasma doping meets this requirement by supplying a flux of inert ions and dopant radicals to the surface. However, the helium ion bombardment needed to infuse dopants into the fin surface can cause poor dose retention. This is due to the interaction between substrate damage and post doping process wet cleaning solutions required in the front end of line large-scale integration fabrication. We present findings from surface microscopy experiments that reveal the mechanism for dose retention in arsenic doped silicon fin samples using a microwave RLSA™ plasma source. Dilute aqueous hydrofluoric acid (DHF) cleans by themselves are incompatible with plasma doping processes because the films deposited over the dosed silicon and ion bombardment damaged silicon are readily removed. Oxidizing wet cleaning chemistries help retain the dose as silica rich over-layers are not significantly degraded. Furthermore, the dosed retention after a DHF clean following an oxidizing wet clean is unchanged. Still, the initial ion bombardment energy and flux are important. Large ion fluxes at energies below the sputter threshold and above the silicon damage threshold, before the silicon surface is covered by an amorphous mixed phase layer, allow for enhanced uptake of dopant into the silicon. The resulting dopant concentration is beyond the saturation limit of crystalline silicon.
NASA Astrophysics Data System (ADS)
Ruzic, D. N.; Alman, D. A.; Jurczyk, B. E.; Stubbers, R.; Coventry, M. D.; Neumann, M. J.; Olczak, W.; Qiu, H.
2004-09-01
Advanced plasma facing components (PFCs) are needed to protect walls in future high power fusion devices. In the semiconductor industry, extreme ultraviolet (EUV) sources are needed for next generation lithography. Lithium and tin are candidate materials in both areas, with liquid Li and Sn plasma material interactions being critical. The Plasma Material Interaction Group at the University of Illinois is leveraging liquid metal experimental and computational facilities to benefit both fields. The Ion surface InterAction eXperiment (IIAX) has measured liquid Li and Sn sputtering, showing an enhancement in erosion with temperature for light ion bombardment. Surface Cleaning of Optics by Plasma Exposure (SCOPE) measures erosion and damage of EUV mirror samples, and tests cleaning recipes with a helicon plasma. The Flowing LIquid surface Retention Experiment (FLIRE) measures the He and H retention in flowing liquid metals, with retention coefficients varying between 0.001 at 500 eV to 0.01 at 4000 eV.
Quantitative cleaning characterization of a lithium-fluoride ion diode
DOE Office of Scientific and Technical Information (OSTI.GOV)
Menge, P.R.; Cuneo, M.E.
An ion source cleaning testbed was created to test plasma-cleaning techniques, and to provide quantitative data on plasma-cleaning protocols prior to implementation on the SABRE accelerator. The testbed was designed to resolve issues regarding the quantity of contaminants absorbed by the anode source (LiF), and the best cleaning methodology. A test chamber was devised containing a duplicate of the SABRE diode. Radio-frequency (RF) power was fed to the anode, which was isolated from ground and thus served as the plasma discharge electrode. RF plasma discharges in 1--3 mtorr of Ar with 10% O{sub 2} were found to provide the bestmore » cleaning of the LiF surface. X-ray photoelectron spectroscopy (XPS) showed that the LiF could accrue dozens of monolayers of carbon just by sitting in a 2 {times} 10{sup {minus}5} vacuum for 24 h. Tests of various discharge cleaning protocols indicated that 15 min of an Ar/O{sub 2} discharge was sufficient to reduce this initial 13--45 monolayers of carbon impurities to 2--4 monolayers. Rapid recontamination of the LiF was also observed. Up to ten monolayers of carbon returned in 2 min after termination of the plasma discharge and subsequent pumping back to the 10{sup {minus}5} torr range. Heating of the LiF also was found to provide anode cleaning. Application of heating combined with plasma cleaning provided the highest cleaning rates.« less
DOE Office of Scientific and Technical Information (OSTI.GOV)
Cunge, G., E-mail: gilles.cunge@cea.fr; Petit-Etienne, C.; Davydova, A.
Graphene is the first engineering electronic material, which is purely two-dimensional: it consists of two exposed sp{sup 2}-hybridized carbon surfaces and has no bulk. Therefore, surface effects such as contamination by adsorbed polymer residues have a critical influence on its electrical properties and can drastically hamper its widespread use in devices fabrication. These contaminants, originating from mandatory technological processes of graphene synthesis and transfer, also impact fundamental studies of the electronic and structural properties at the atomic scale. Therefore, graphene-based technology and research requires “soft” and selective surface cleaning techniques dedicated to limit or to suppress this surface contamination. Here,more » we show that a high-density H{sub 2} and H{sub 2}-N{sub 2} plasmas can be used to selectively remove polymeric residues from monolayer graphene without any damage on the graphene surface. The efficiency of this dry-cleaning process is evidenced unambiguously by a set of spectroscopic and microscopic methods, providing unprecedented insights on the cleaning mechanisms and highlighting the role of specific poly-methyl-methacrylate residues at the graphene interface. The plasma is shown to perform much better cleaning than solvents and has the advantage to be an industrially mature technology adapted to large area substrates. The process is transferable to other kinds of two-dimensional material and heterostructures.« less
Cleaning of inner vacuum surfaces in the Uragan-3M facility by radio-frequency discharges
DOE Office of Scientific and Technical Information (OSTI.GOV)
Lozin, A. V., E-mail: alexlozin@meta.ua; Moiseenko, V. E.; Grigor’eva, L. I.
2013-08-15
A method for cleaning vacuum surfaces by a low-temperature (T{sub e} ∼ 10 eV) relatively dense (n{sub e} ≈ 10{sup 12} cm{sup −3}) plasma of an RF discharge was developed and successfully applied at the Uragan-3M torsatron. The convenience of the method is that it can be implemented with the same antenna system and RF generators that are used to produce and heat the plasma in the operating mode and does not require retuning the frequencies of the antennas and RF generators. The RF discharge has a high efficiency from the standpoint of cleaning vacuum surfaces. After performing a seriesmore » of cleanings by the low-temperature RF discharge plasma (about 20000 pulses), (i) the intensity of the CIII impurity line was substantially reduced, (ii) a quasi-steady operating mode with a duration of up to 50 ms, a plasma density of n{sub e} ≈ 10{sup 12} cm{sup −3}, and an electron temperature of up to T{sub e} ∼ 1 keV was achieved, and (iii) mass spectrometric analysis of the residual gas in the chamber indicated a significant reduction in the impurity content.« less
RF plasma cleaning of silicon substrates with high-density polyethylene contamination
NASA Astrophysics Data System (ADS)
Cagomoc, Charisse Marie D.; De Leon, Mark Jeffry D.; Ebuen, Anna Sophia M.; Gilos, Marlo Nicole R.; Vasquez, Magdaleno R., Jr.
2018-01-01
Upon contact with a polymeric material, microparticles from the polymer may adhere to a silicon (Si) substrate during device processing. The adhesion contaminates the surface and, in turn, leads to defects in the fabricated Si-based microelectronic devices. In this study, Si substrates with artificially induced high-density polyethylene (HDPE) contamination was exposed to 13.56 MHz radio frequency (RF) plasma utilizing argon and oxygen gas admixtures at a power density of 5.6 W/cm2 and a working pressure of 110 Pa for up to 6 min of treatment. Optical microscopy studies revealed the removal of up to 74% of the polymer contamination upon plasma exposure. Surface free energy (SFE) increased owing to the removal of contaminants as well as the formation of polar groups on the Si surface after plasma treatment. Atomic force microscopy scans showed a decrease in surface roughness from 12.25 nm for contaminated samples to 0.77 nm after plasma cleaning. The smoothening effect can be attributed to the removal of HDPE particles from the surface. In addition, scanning electron microscope images showed that there was a decrease in the amount of HDPE contaminants adhering onto the surface after plasma exposure.
Reduction of Trapped-Ion Anomalous Heating by in situ Surface Plasma Cleaning
2015-04-29
the trap chip temperature. To load ions, we initially cool 88Sr atoms into a remotely-located magneto - optical trap (MOT), then use a resonant push beam... trap heating rates [10]. Furthermore, some previous experiments have shown an improvement in the heating rates of surface-electrode ion traps after...rate when the trap chip is held at 4 K is not significantly improved by the plasma cleaning. While the observed frequency scaling is not the same in
Development of a laboratory demonstration model active cleaning device
NASA Technical Reports Server (NTRS)
Shannon, R. L.; Gillette, R. B.
1975-01-01
A laboratory demonstration model of a device for removing contaminant films from optical surfaces in space was developed. The development of a plasma tube, which would produce the desired cleaning effects under high vacuum conditions, represented the major problem in the program. This plasma tube development is discussed, and the resulting laboratory demonstration-model device is described.
Two-Step Plasma Process for Cleaning Indium Bonding Bumps
NASA Technical Reports Server (NTRS)
Greer, Harold F.; Vasquez, Richard P.; Jones, Todd J.; Hoenk, Michael E.; Dickie, Matthew R.; Nikzad, Shouleh
2009-01-01
A two-step plasma process has been developed as a means of removing surface oxide layers from indium bumps used in flip-chip hybridization (bump bonding) of integrated circuits. The two-step plasma process makes it possible to remove surface indium oxide, without incurring the adverse effects of the acid etching process.
Plasma cleaning and analysis of archeological artefacts from Sipán
NASA Astrophysics Data System (ADS)
Saettone, E. A. O.; da Matta, J. A. S.; Alva, W.; Chubaci, J. F. O.; Fantini, M. C. A.; Galvão, R. M. O.; Kiyohara, P.; Tabacniks, M. H.
2003-04-01
A novel procedure using plasma sputtering in an electron-cyclotron-resonance device has been applied to clean archeological MOCHE artefacts, unearthed at the Royal Tombs of Sipán. After successful cleaning, the pieces were analysed by a variety of complementary techniques, namely proton-induced x-ray emission, Rutherford backscattering spectroscopy, x-ray diffraction, electron microscopy, and inductively coupled plasma mass spectroscopy. With these techniques, it has been possible to not only determine the profiles of the gold and silver surface layers, but also to detect elements that may be relevant to explain the gilding techniques skillfully developed by the metal smiths of the MOCHE culture.
NASA Astrophysics Data System (ADS)
Sentis, M. L.; Delaporte, Ph; Marine, W.; Uteza, O.
2000-06-01
The laser ablation performed with an automated excimer XeCl laser unit is used for large surface cleaning. The study focuses on metal surfaces that are oxidised and are representative of contaminated surfaces with radionuclides in a context of nuclear power plant maintenance. The unit contains an XeCl laser, the beam delivery system, the particle collection cell, and the system for real-time control of cleaning processes. The interaction of laser radiation with a surface is considered, in particular, the surface damage caused by cleaning radiation. The beam delivery system consists of an optical fibre bundle of 5 m long and allows delivering 150 W at 308 nm for laser surface cleaning. The cleaning process is controlled by analysing in real time the plasma electric field evolution. The system permits the cleaning of 2 to 6 m2 h-1 of oxides with only slight substrate modifications.
NASA Astrophysics Data System (ADS)
Tyagi, P. V.; Moss, Andrew; Goudket, Philippe; Pattalwar, Shrikant; Herbert, Joe; Valizadeh, Reza; McIntosh, Peter
2018-06-01
Field emission is one of the critical issues in the superconducting radio frequency (SRF) cavities and can degrade their accelerating gradient during operation. The contamination present at top surface of the SRF cavity is one of the foremost reasons for field emission. Plasma based surface processing can be a viable option to eliminate such surface contaminants and enhance performance of the SRF cavity especially for in-situ applications. These days, 1.3 GHz nine-cell SRF cavity has become baseline standard for many particle accelerators, it is of interest to develop plasma cleaning technique for such SRF cavities. In the development of the plasma processing technique for SRF cavities, the most challenging task is to ignite and tune the plasma in different cells of the SRF cavity. At Daresbury laboratory, UK, we have successfully achieved plasma ignition in different cells of a 1.3 GHz nine-cell SRF cavity. The plasma ignition in different cells of the cavity was accomplished at room temperature towards room temperature plasma cleaning of the SRF cavity surface. Here, we report the successful demonstration of the plasma ignition in different cells of a 1.3 GHz nine-cell SRF cavity.
Plasma cleaning of ITER edge Thomson scattering mock-up mirror in the EAST tokamak
NASA Astrophysics Data System (ADS)
Yan, Rong; Moser, Lucas; Wang, Baoguo; Peng, Jiao; Vorpahl, Christian; Leipold, Frank; Reichle, Roger; Ding, Rui; Chen, Junling; Mu, Lei; Steiner, Roland; Meyer, Ernst; Zhao, Mingzhong; Wu, Jinhua; Marot, Laurent
2018-02-01
First mirrors are the key element of all optical and laser diagnostics in ITER. Facing the plasma directly, the surface of the first mirrors could be sputtered by energetic particles or deposited with contaminants eroded from the first wall (tungsten and beryllium), which would result in the degradation of the reflectivity. The impurity deposits emphasize the necessity of the first mirror in situ cleaning for ITER. The mock-up first mirror system for ITER edge Thomson scattering diagnostics has been cleaned in EAST for the first time in a tokamak using radio frequency capacitively coupled plasma. The cleaning properties, namely the removal of contaminants and homogeneity of cleaning were investigated with molybdenum mirror insets (25 mm diameter) located at five positions over the mock-up plate (center to edge) on which 10 nm of aluminum oxide, used as beryllium proxy, were deposited. The cleaning efficiency was evaluated using energy dispersive x-ray spectroscopy, reflectivity measurements and x-ray photoelectron spectroscopy. Using argon or neon plasma without magnetic field in the laboratory and with a 1.7 T magnetic field in the EAST tokamak, the aluminum oxide films were homogeneously removed. The full recovery of the mirrors’ reflectivity was attained after cleaning in EAST with the magnetic field, and the cleaning efficiency was about 40 times higher than that without the magnetic field. All these results are promising for the plasma cleaning baseline scenario of ITER.
FY 2017 Center Innovation Fund Annual Report - Highlights/Abstract section
NASA Technical Reports Server (NTRS)
Hintze, Paul; Youngquist, Robert C.; Massa, Gioia D.; Meier, Anne J.
2017-01-01
This project evaluated the feasibility of low pressure cold plasma (CP) for two applications: disinfection of produce grown in space and sterilization of medical equipment in space. Currently there is no ISS capability for disinfecting pick and eat crops, food utensils, food production areas, or medical devices. This deficit is extended to projected long duration missions. Small, portable, cold plasma devices would provide an enhanced benefit to crew health and address issues concerning microbial cross contamination. The technology would contribute to the reduction of solid waste since currently crews utilize benzalkonium chloride wet wipes for cleaning surfaces and might use PRO-SAN wipes for cleaning vegetables. CP cleaning/disinfection/sterilization can work on many surfaces, including all metals, most polymers, and this project evaluated produce. Therefore CP provides a simple system that has many different cleaning application in space: produce, medical equipment, cutlery, miscellaneous tools.
Radio-Frequency Plasma Cleaning of a Penning Malmberg Trap
NASA Technical Reports Server (NTRS)
Sims, William Herbert, III; Martin, James; Pearson, J. Boise; Lewis, Raymond
2005-01-01
Radio-frequency-generated plasma has been demonstrated to be a promising means of cleaning the interior surfaces of a Penning-Malmberg trap that is used in experiments on the confinement of antimatter. {Such a trap was reported in Modified Penning-Malmberg Trap for Storing Antiprotons (MFS-31780), NASA Tech Briefs, Vol. 29, No. 3 (March 2005), page 66.} Cleaning of the interior surfaces is necessary to minimize numbers of contaminant atoms and molecules, which reduce confinement times by engaging in matter/antimatter-annihilation reactions with confined antimatter particles. A modified Penning-Malmberg trap like the one described in the cited prior article includes several collinear ring electrodes (some of which are segmented) inside a tubular vacuum chamber, as illustrated in Figure 1. During operation of the trap, a small cloud of charged antiparticles (e.g., antiprotons or positrons) is confined to a spheroidal central region by means of a magnetic field in combination with DC and radiofrequency (RF) electric fields applied via the electrodes. In the present developmental method of cleaning by use of RF-generated plasma, one evacuates the vacuum chamber, backfills the chamber with hydrogen at a suitable low pressure, and uses an RF-signal generator and baluns to apply RF voltages to the ring electrodes. Each ring is excited in the polarity opposite that of the adjacent ring. The electric field generated by the RF signal creates a discharge in the low-pressure gas. The RF power and gas pressure are adjusted so that the plasma generated in the discharge (see Figure 2) physically and chemically attacks any solid, liquid, and gaseous contaminant layers on the electrode surfaces. The products of the physical and chemical cleaning reactions are gaseous and are removed by the vacuum pumps.
Effect of Dielectric and Liquid on Plasma Sterilization Using Dielectric Barrier Discharge Plasma
Mastanaiah, Navya; Johnson, Judith A.; Roy, Subrata
2013-01-01
Plasma sterilization offers a faster, less toxic and versatile alternative to conventional sterilization methods. Using a relatively small, low temperature, atmospheric, dielectric barrier discharge surface plasma generator, we achieved ≥6 log reduction in concentration of vegetative bacterial and yeast cells within 4 minutes and ≥6 log reduction of Geobacillus stearothermophilus spores within 20 minutes. Plasma sterilization is influenced by a wide variety of factors. Two factors studied in this particular paper are the effect of using different dielectric substrates and the significance of the amount of liquid on the dielectric surface. Of the two dielectric substrates tested (FR4 and semi-ceramic (SC)), it is noted that the FR4 is more efficient in terms of time taken for complete inactivation. FR4 is more efficient at generating plasma as shown by the intensity of spectral peaks, amount of ozone generated, the power used and the speed of killing vegetative cells. The surface temperature during plasma generation is also higher in the case of FR4. An inoculated FR4 or SC device produces less ozone than the respective clean devices. Temperature studies show that the surface temperatures reached during plasma generation are in the range of 30°C–66°C (for FR4) and 20°C–49°C (for SC). Surface temperatures during plasma generation of inoculated devices are lower than the corresponding temperatures of clean devices. pH studies indicate a slight reduction in pH value due to plasma generation, which implies that while temperature and acidification may play a minor role in DBD plasma sterilization, the presence of the liquid on the dielectric surface hampers sterilization and as the liquid evaporates, sterilization improves. PMID:23951023
Effect of dielectric and liquid on plasma sterilization using dielectric barrier discharge plasma.
Mastanaiah, Navya; Johnson, Judith A; Roy, Subrata
2013-01-01
Plasma sterilization offers a faster, less toxic and versatile alternative to conventional sterilization methods. Using a relatively small, low temperature, atmospheric, dielectric barrier discharge surface plasma generator, we achieved ≥ 6 log reduction in concentration of vegetative bacterial and yeast cells within 4 minutes and ≥ 6 log reduction of Geobacillus stearothermophilus spores within 20 minutes. Plasma sterilization is influenced by a wide variety of factors. Two factors studied in this particular paper are the effect of using different dielectric substrates and the significance of the amount of liquid on the dielectric surface. Of the two dielectric substrates tested (FR4 and semi-ceramic (SC)), it is noted that the FR4 is more efficient in terms of time taken for complete inactivation. FR4 is more efficient at generating plasma as shown by the intensity of spectral peaks, amount of ozone generated, the power used and the speed of killing vegetative cells. The surface temperature during plasma generation is also higher in the case of FR4. An inoculated FR4 or SC device produces less ozone than the respective clean devices. Temperature studies show that the surface temperatures reached during plasma generation are in the range of 30°C-66 °C (for FR4) and 20 °C-49 °C (for SC). Surface temperatures during plasma generation of inoculated devices are lower than the corresponding temperatures of clean devices. pH studies indicate a slight reduction in pH value due to plasma generation, which implies that while temperature and acidification may play a minor role in DBD plasma sterilization, the presence of the liquid on the dielectric surface hampers sterilization and as the liquid evaporates, sterilization improves.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Overzet, Lawrence J.; Raja, L.
The research program was collaborative between the researchers at the University of Texas at Dallas and the University of Texas at Austin. The primary subject of this program was to investigate the possibility of active control of secondary electron emission (SEE) from surfaces in contact with plasmas and thereby actively control plasmas. Very few studies of ion-induced electron emission (IIEE) from semiconductors exist, and those that do exist primarily used high-energy ion beams in the experiments. Furthermore, those few studies took extreme measures to ensure that the measurements were performed on atomically clean surfaces because of the surface sensitivity ofmore » the IIEE process. Even a small exposure to air can change the IIEE yield significantly. In addition, much of the existing data for IIEE from semiconductors was obtained in the 1950s and ‘60s, when semiconductor materials were first being refined. As a result, nearly all of that data is for p-type Ge and Si. Before this investigation, experimental data on n-type materials was virtually non-existent. While the basic theory assumed that IIEE yields ought to be substantially independent of doping type and concentration, recent measurements of near atmospheric pressure plasmas and of breakdown suggested otherwise. These indirect measurements were made on surfaces that were not atomically clean and seemed to indicate that deep sub-surface changes to the bulk conduction band electron density could lead to substantial variations in the IIEE yield. Exactly in contradiction to the generally accepted theory. Insufficient direct data existed to settle the matter. We performed both experimental measurements and theoretical calculations of IIEE yields from both Si and Ge in order to help clarify whether or not conduction band electrons substantially change the IIEE yield. We used three wafers of each material to carry out the investigation: a heavily doped p-type, an intrinsic and a heavily doped n-type wafer. There was approximately a factor of 10 15 difference in the conduction band electron densities of the p-type and n-type Si wafers and a factor of 10 10 for Ge. We investigated semiconductor surfaces that were both chemically cleaned (not atomically clean) and sputter cleaned (much closer to atomically clean), since such measurements are more relevant to recent indirect measurements. In addition to IIEE measurements, X-ray and ultraviolet photoelectron spectroscopies (XPS and UPS) were utilized to better understand the results.« less
Cleaning Carbon Nanotubes by Use of Mild Oxygen Plasmas
NASA Technical Reports Server (NTRS)
Petkov, Mihail
2006-01-01
Experiments have shown that it is feasible to use oxygen radicals (specifically, monatomic oxygen) from mild oxygen plasmas to remove organic contaminants and chemical fabrication residues from the surfaces of carbon nanotubes (CNTs) and metal/CNT interfaces. A capability for such cleaning is essential to the manufacture of reproducible CNT-based electronic devices. The use of oxygen radicals to clean surfaces of other materials is fairly well established. However, previously, cleaning of CNTs and of graphite by use of oxygen plasmas had not been attempted because both of these forms of carbon were known to be vulnerable to destruction by oxygen plasmas. The key to success of the present technique is, apparently, to ensure that the plasma is mild . that is to say, that the kinetic and internal energies of the oxygen radicals in the plasma are as low as possible. The plasma oxygen-radical source used in the experiments was a commercial one marketed for use in removing hydrocarbons and other organic contaminants from vacuum systems and from electron microscopes and other objects placed inside vacuum systems. In use, the source is installed in a vacuum system and air is leaked into the system at such a rate as to maintain a background pressure of .0.56 torr (.75 Pa). In the source, oxygen from the air is decomposed into monatomic oxygen by radio-frequency excitation of a resonance of the O2 molecule (N2 is not affected). Hence, what is produced is a mild (non-energetic) oxygen plasma. The oxygen radicals are transported along with the air molecules in the flow created by the vacuum pump. In the experiments, exposure to the oxygen plasma in this system was shown to remove organic contaminants and chemical fabrication residues from several specimens. Many high-magnification scanning electron microscope (SEM) images of CNTs were taken before and after exposure to the oxygen plasma. As in the example shown in the figure, none of these images showed evidence of degradation of CNT structures.
Cleaning of HT-7 Tokamak Exposed First Mirrors by Radio Frequency Magnetron Sputtering Plasma
NASA Astrophysics Data System (ADS)
Yan, Rong; Chen, Junling; Chen, Longwei; Ding, Rui; Zhu, Dahuan
2014-12-01
The stainless steel (SS) first mirror pre-exposed in the deposition-dominated environment of the HT-7 tokamak was cleaned in the newly built radio frequency (RF) magnetron sputtering plasma device. The deposition layer on the FM surface formed during the exposure was successfully removed by argon plasma with a RF power of about 80 W and a gas pressure of 0.087 Pa for 30 min. The total reflectivity of the mirrors was recovered up to 90% in the wavelength range of 300-800 nm, while the diffuse reflectivity showed a little increase, which was attributed to the increase of surface roughness in sputtering, and residual contaminants. The FMs made from single crystal materials could help to achieve a desired recovery of specular reflectivity in the future.
Study of discharge cleaning process in JIPP T-2 Torus by residual gas analyzer
NASA Astrophysics Data System (ADS)
Noda, N.; Hirokura, S.; Taniguchi, Y.; Tanahashi, S.
1982-12-01
During discharge cleaning, decay time of water vapor pressure changes when the pressure reaches a certain level. A long decay time observed in the later phase can be interpreted as a result of a slow deoxidization rate of chromium oxide, which may dominate the cleaning process in this phase. Optimization of plasma density for the cleaning is discussed comparing the experimental results on density dependence of water vapor pressure with a result based on a zero dimensional calculation for particle balance. One of the essential points for effective cleaning is the raising of the electron density of the plasma high enough that the dissociation loss rate of H2O is as large as the sticking loss rate. A density as high as 10 to the 11th power/cu cm is required for a clean surface condition where sticking probability is presumed to be around 0.5.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Abdullin, I.Sh.; Bragin, V.E.; Bykanov, A.N.
Gas discharge plasma modification of polymer materials and metals is one of the known physical approaches for improving of materials biocompatibility in ophthalmology and surgery. The surface treatment in RF discharges can be effectively realized in the discharge afterglow and in the discharge region itself too. This modification method is more convenient and produces more uniform surfaces in comparison with other discharge types. The carried out experiments and published up to now results show that interaction of UV radiation, fluxes of ions, electrons and metastable particles with material`s surface changes chemical composition and surface structure. The exerting of these agentsmore » on the sample surface produces the following effects. There are processes of physical and plasma-chemical surface etching producing effective surface cleaning of different types of contaminations. It may be surface contaminations by hydrocarbons because of preliminary surface contacts with biological or physical bodies. It may be surface contaminations caused by characteristic properties of chemical technology too. There is a surface layer with thickness from some angstroms up to few hundreds of angstroms. The chemical content and structure of this layer is distinguished from the bulk polymer properties. The presence of such {open_quotes}technological{close_quotes} contaminations produces the layer of material substantially differing from the base polymer. The basic layer physical and chemical properties for example, gas permeation rate may substantially differ from the base polymer. Attempts to clean the surface from these contaminations by chemical methods (solutions) have not been successful and produced contaminations of more deep polymer layers. So the plasma cleaning is the most profitable method of polymer treatment for removing the surface contaminations. The improving of wettability occurs during this stage of treatment.« less
NASA Astrophysics Data System (ADS)
Bobzin, K.; Öte, M.; Wiesner, S.
2017-03-01
The quality of brazed joints is determined by different factors such as the atmosphere and the parameters during brazing as well as the condition of the brazing surfaces. Residues of lubricants used during machining of the components and the subsequent cleaning processes can contaminate the faying surfaces and can hence influence the flow ability of the molten filler metals. Besides their influence on the filler metal flow, the residues can result in the formation of carbonic phases in the joint leading to a possible reduction of the corrosion resistance and the mechanical properties. The first step of the current study with the aim of avoiding these defects is to identify the influence of critical contaminations and cleaning methods on the quality of the brazed joints. In a first step, contaminations on AISI304 and Inconel alloy 625 due to different cooling lubricants and the effect of several cleaning methods, in particular plasma cleaning, have been investigated. Information about the surface energy of contaminated and cleaned surfaces was gained by measuring contact angle of testing fluids. Additionally, the lubricants and the resulting contamination products have been analyzed considering the influence of a heat treatment.
NASA Astrophysics Data System (ADS)
Chartosias, Marios
Acceptance of Carbon Fiber Reinforced Polymer (CFRP) structures requires a robust surface preparation method with improved process controls capable of ensuring high bond quality. Surface preparation in a production clean room environment prior to applying adhesive for bonding would minimize risk of contamination and reduce cost. Plasma treatment is a robust surface preparation process capable of being applied in a production clean room environment with process parameters that are easily controlled and documented. Repeatable and consistent processing is enabled through the development of a process parameter window utilizing techniques such as Design of Experiments (DOE) tailored to specific adhesive and substrate bonding applications. Insight from respective plasma treatment Original Equipment Manufacturers (OEMs) and screening tests determined critical process factors from non-factors and set the associated factor levels prior to execution of the DOE. Results from mode I Double Cantilever Beam (DCB) testing per ASTM D 5528 [1] standard and DOE statistical analysis software are used to produce a regression model and determine appropriate optimum settings for each factor.
NASA Astrophysics Data System (ADS)
Paredes, Virginia; Salvagni, Emiliano; Rodríguez-Castellón, Enrique; Manero, José María
2017-08-01
Metals are widely employed for many biological artificial replacements, and it is known that the quality and the physical/chemical properties of the surface are crucial for the success of the implant. Therefore, control over surface implant materials and their elastic moduli may be crucial to avoid undesired effects. In this study, surface modification upon cleaning and activation of a low elastic modulus Ti alloy (Ti25Hf21Nb) was investigated. Two different methods, oxygen plasma (OP) cleaning and piranha (PI) solution, were studied and compared. Both surface treatments were effective for organic contaminant removal and to increase the Ti-oxide layer thickness rather than other metal-oxides present at the surface, which is beneficial for biocompatibility of the material. Furthermore, both techniques drastically increased hydrophilicity and introduced oxidation and hydroxylation (OH)-functional groups at the surface that may be beneficial for further chemical modifications. However, these treatments did not alter the surface roughness and bulk material properties. The surfaces were fully characterized in terms of surface roughness, wettability, oxide layer composition, and hydroxyl surface density through analytical techniques (interferometry, X-ray photoelectron spectroscopy (XPS), contact angle, and zinc complexation). These findings provide essential information when planning surface modifications for cleanliness, oxide layer thickness, and surface hydroxyl density, as control over these factors is essential for many applications, especially in biomaterials.
Characterization of Low Pressure Cold Plasma in the Cleaning of Contaminated Surfaces
NASA Technical Reports Server (NTRS)
Lanz, Devin Garrett; Hintze, Paul E.
2016-01-01
The characterization of low pressure cold plasma is a broad topic which would benefit many different applications involving such plasma. The characterization described in this paper focuses on cold plasma used as a medium in cleaning and disinfection applications. Optical Emission Spectroscopy (OES) and Mass Spectrometry (MS) are the two analytical methods used in this paper to characterize the plasma. OES analyzes molecules in the plasma phase by displaying the light emitted by the plasma molecules on a graph of wavelength vs. intensity. OES was most useful in identifying species which may interact with other molecules in the plasma, such as atomic oxygen or hydroxide radicals. Extracting useful data from the MS is done by filtering out the peaks generated by expected molecules and looking for peaks caused by foreign ones leaving the plasma chamber. This paper describes the efforts at setting up and testing these methods in order to accurately and effectively characterize the plasma.
Cleaning of optical surfaces by capacitively coupled RF discharge plasma
DOE Office of Scientific and Technical Information (OSTI.GOV)
Yadav, P. K., E-mail: praveenyadav@rrcat.gov.in; Rai, S. K.; Nayak, M.
2014-04-24
In this paper, we report cleaning of carbon capped molybdenum (Mo) thin film by in-house developed radio frequency (RF) plasma reactor, at different powers and exposure time. Carbon capped Mo films were exposed to oxygen plasma for different durations at three different power settings, at a constant pressure. After each exposure, the thickness of the carbon layer and the roughness of the film were determined by hard x-ray reflectivity measurements. It was observed that most of the carbon film got removed in first 15 minutes exposure. A high density layer formed on top of the Mo film was also observedmore » and it was noted that this layer cannot be removed by successive exposures at different powers. A significant improvement in interface roughness with a slight improvement in top film roughness was observed. The surface roughness of the exposed and unexposed samples was also confirmed by atomic force microscopy measurements.« less
Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil
NASA Astrophysics Data System (ADS)
Vadym, Prysiazhnyi; Pavel, Slavicek; Eliska, Mikmekova; Milos, Klima
2016-04-01
This paper is aimed to show the influence of initial chemical pretreatment prior to subsequent plasma activation of aluminum surfaces. The results of our study showed that the state of the topmost surface layer (i.e. the surface morphology and chemical groups) of plasma modified aluminum significantly depends on the chemical precleaning. Commonly used chemicals (isopropanol, trichlorethane, solution of NaOH in deionized water) were used as precleaning agents. The plasma treatments were done using a radio frequency driven atmospheric pressure plasma pencil developed at Masaryk University, which operates in Ar, Ar/O2 gas mixtures. The effectiveness of the plasma treatment was estimated by the wettability measurements, showing high wettability improvement already after 0.3 s treatment. The effects of surface cleaning (hydrocarbon removal), surface oxidation and activation (generation of OH groups) were estimated using infrared spectroscopy. The changes in the surface morphology were measured using scanning electron microscopy. Optical emission spectroscopy measurements in the near-to-surface region with temperature calculations showed that plasma itself depends on the sample precleaning procedure.
Plasma-assisted oxide removal from ruthenium-coated EUV optics
NASA Astrophysics Data System (ADS)
Dolgov, A.; Lee, C. J.; Bijkerk, F.; Abrikosov, A.; Krivtsun, V. M.; Lopaev, D.; Yakushev, O.; van Kampen, M.
2018-04-01
An experimental study of oxide reduction at the surface of ruthenium layers on top of multilayer mirrors and thin Ru/Si films is presented. Oxidation and reduction processes were observed under conditions close to those relevant for extreme ultraviolet lithography. The oxidized ruthenium surface was exposed to a low-temperature hydrogen plasma, similar to the plasma induced by extreme ultraviolet radiation. The experiments show that hydrogen ions are the main reducing agent. Furthermore, the addition of hydrogen radicals increases the reduction rate beyond that expected from simple flux calculations. We show that low-temperature hydrogen plasmas can be effective for reducing oxidized top surfaces. Our proof-of-concept experiments show that an in situ, EUV-generated plasma cleaning technology is feasible.
Processing for Highly Efficient AlGaN/GaN Emitters
2009-09-09
effects of SiCl4 plasma treatment and subsequent cleaning in BOE, HCl, and NH4OH solutions on n-GaN and n- AlGaN surfaces using XPS and AES. The...was the as-grown GaN layer without any surface treatment while sample 2 was treated with SiCl4 plasma in a reactive ion etching (RIE) system with a...plasma self-bias voltage of −300 V for 60 s. Samples 3, 4, and 5 were treated with SiCl4 plasma and followed by a 2-min dip in NH4OH, HCl, and BOE
Low-pressure RF remote plasma cleaning of carbon-contaminated B4C-coated optics
NASA Astrophysics Data System (ADS)
Moreno Fernández, H.; Thomasset, M.; Sauthier, G.; Rogler, D.; Dietsch, R.; Barrett, R.; Carlino, V.; Pellegrin, E.
2017-05-01
Boron carbide (B4C) - due to its exceptional mechanical properties - is one of the few existing materials that can withstand the extremely high brilliance of the photon beam from free electron lasers (FELs) and is thus of considerable interest for optical applications in this field. However, as in the case of many other optics operated at modern accelerator-, plasma-, or laser-based light source facilities, B4C-coated optics are subject to ubiquitous carbon contaminations. These contaminations - that are presumably produced via cracking of CHx and CO2 molecules by photoelectrons emitted from the optical components - represent a serious issue for the operation of the pertinent high performance beamlines due to a severe reduction of photon flux and beam coherence, not necessarily restricted to the photon energy range of the carbon K-edge. Thus, a variety of B4C cleaning technologies have been developed at different laboratories with varying success [1]. Here, we present a study regarding the low-pressure RF plasma cleaning of a series of carbon-contaminated B4C test samples via an inductively coupled O2/Ar and Ar/H2 remote RF plasma produced using the IBSS GV10x plasma source following previous studies using the same RF plasma source [2, 3]. Results regarding the chemistry, morphology as well as other aspects of the B4C optical coatings and surfaces before and after the plasma cleaning process are reported.
Banerjee, K K; Kumar, S; Bremmell, K E; Griesser, H J
2010-11-01
Established methods for cleaning and sterilising biomedical devices may achieve removal of bioburden only at the macroscopic level while leaving behind molecular levels of contamination (mainly proteinaceous). This is of particular concern if the residue might contain prions. We investigated at the molecular level the removal of model and real-life proteinaceous contamination from model and practical surfaces by air plasma (ionised air) treatment. The surface-sensitive technique of X-ray photoelectron spectroscopy (XPS) was used to assess the removal of proteinaceous contamination, with the nitrogen (N1s) photoelectron signal as its marker. Model proteinaceous contamination (bovine serum albumin) adsorbed on to a model surface (silicon wafer) and the residual proteinaceous contamination resulting from incubating surgical stainless steel (a practical biomaterial) in whole human blood exhibited strong N1s signals [16.8 and 18.5 atomic percent (at.%), respectively] after thorough washing. After 5min air plasma treatment, XPS detected no nitrogen on the sample surfaces, indicating complete removal of proteinaceous contamination, down to the estimated XPS detection limit 10ng/cm(2). Applying the same plasma treatment, the 7.7at.% nitrogen observed on a clinically cleaned dental bur was reduced to a level reflective of new, as-received burs. Contact angle measurements and atomic force microscopy also indicated complete molecular-level removal of the proteinaceous contamination upon air plasma treatment. This study demonstrates the effectiveness of air plasma treatment for removing proteinaceous contamination from both model and practical surfaces and offers a method for ensuring that no molecular residual contamination such as prions is transferred upon re-use of surgical and dental instruments. Crown Copyright © 2010. Published by Elsevier Ltd. All rights reserved.
Delta-Doping at Wafer Level for High Throughput, High Yield Fabrication of Silicon Imaging Arrays
NASA Technical Reports Server (NTRS)
Hoenk, Michael E. (Inventor); Nikzad, Shoulch (Inventor); Jones, Todd J. (Inventor); Greer, Frank (Inventor); Carver, Alexander G. (Inventor)
2014-01-01
Systems and methods for producing high quantum efficiency silicon devices. A silicon MBE has a preparation chamber that provides for cleaning silicon surfaces using an oxygen plasma to remove impurities and a gaseous (dry) NH3 + NF3 room temperature oxide removal process that leaves the silicon surface hydrogen terminated. Silicon wafers up to 8 inches in diameter have devices that can be fabricated using the cleaning procedures and MBE processing, including delta doping.
Modification of the surface properties of glass-ceramic materials at low-pressure RF plasma stream
NASA Astrophysics Data System (ADS)
Tovstopyat, Alexander; Gafarov, Ildar; Galeev, Vadim; Azarova, Valentina; Golyaeva, Anastasia
2018-05-01
The surface roughness has a huge effect on the mechanical, optical, and electronic properties of materials. In modern optical systems, the specifications for the surface accuracy and smoothness of substrates are becoming even more stringent. Commercially available pre-polished glass-ceramic substrates were treated with the radio frequency (RF) inductively coupled (13.56 MHz) low-pressure plasma to clean the surface of the samples and decrease the roughness. Optical emission spectroscopy was used to investigate the plasma stream parameters and phase-shifted interferometry to investigate the surface of the specimen. In this work, the dependence of RF inductively coupled plasma on macroscopic parameters was investigated with the focus on improving the surfaces. The ion energy, sputtering rate, and homogeneity were investigated. The improvements of the glass-ceramic surfaces from 2.6 to 2.2 Å root mean square by removing the "waste" after the previous operations had been achieved.
Liu, Donghua; Chen, Xiaosong; Hu, Yibin; Sun, Tai; Song, Zhibo; Zheng, Yujie; Cao, Yongbin; Cai, Zhi; Cao, Min; Peng, Lan; Huang, Yuli; Du, Lei; Yang, Wuli; Chen, Gang; Wei, Dapeng; Wee, Andrew Thye Shen; Wei, Dacheng
2018-01-15
Graphene is regarded as a potential surface-enhanced Raman spectroscopy (SERS) substrate. However, the application of graphene quantum dots (GQDs) has had limited success due to material quality. Here, we develop a quasi-equilibrium plasma-enhanced chemical vapor deposition method to produce high-quality ultra-clean GQDs with sizes down to 2 nm directly on SiO 2 /Si, which are used as SERS substrates. The enhancement factor, which depends on the GQD size, is higher than conventional graphene sheets with sensitivity down to 1 × 10 -9 mol L -1 rhodamine. This is attributed to the high-quality GQDs with atomically clean surfaces and large number of edges, as well as the enhanced charge transfer between molecules and GQDs with appropriate diameters due to the existence of Van Hove singularities in the electronic density of states. This work demonstrates a sensitive SERS substrate, and is valuable for applications of GQDs in graphene-based photonics and optoelectronics.
Enomoto, Junko; Kageyama, Tatsuto; Myasnikova, Dina; Onishi, Kisaki; Kobayashi, Yuka; Taruno, Yoko; Kanai, Takahiro; Fukuda, Junji
2018-05-01
Self-assembled monolayers (SAMs) have been used to elucidate interactions between cells and material surface chemistry. Gold surfaces modified with oligopeptide SAMs exhibit several unique characteristics, such as cell-repulsive surfaces, micropatterns of cell adhesion and non-adhesion regions for control over cell microenvironments, and dynamic release of cells upon external stimuli under culture conditions. However, basic procedures for the preparation of oligopeptide SAMs, including appropriate cleaning methods of the gold surface before modification, have not been fully established. Because gold surfaces are readily contaminated with organic compounds in the air, cleaning methods may be critical for SAM formation. In this study, we examined the effects of four gold cleaning methods: dilute aqua regia, an ozone water, atmospheric plasma, and UV irradiation. Among the methods, UV irradiation most significantly improved the formation of oligopeptide SAMs in terms of repulsion of cells on the surfaces. We fabricated an apparatus with a UV light source, a rotation table, and HEPA filter, to treat a number of gold substrates simultaneously. Furthermore, UV-cleaned gold substrates were capable of detaching cell sheets without serious cell injury. This may potentially provide a stable and robust approach to oligopeptide SAM-based experiments for biomedical studies. Copyright © 2017 The Society for Biotechnology, Japan. Published by Elsevier B.V. All rights reserved.
Dual Electrolytic Plasma Processing for Steel Surface Cleaning and Passivation
NASA Astrophysics Data System (ADS)
Yang, L.; Zhang, P.; Shi, J.; Liang, J.; Tian, W. B.; Zhang, Y. M.; Sun, Z. M.
2017-10-01
To remove the rust on rebars and passivate the fresh surfaces, electrodes reversing electrolytic plasma processing (EPP) was proposed and conducted in a 10 wt.% Na2CO3 aqueous solution. The morphology and the composition of the surface were investigated by SEM and XPS. Experimental results show that the rust on the surface was removed effectively by cathode EPP, and a passive film containing Cr2O3 was achieved by the succeeding anode EPP treatment, by a simple operation of reversing the bias. The corrosion resistance was evaluated in a 3.5 wt.% NaCl aqueous solution using an electrochemical workstation. In comparison, the corrosion resistance was improved by the succeeding anode EPP treatment, which is evidenced by a positive shift of the open-circuit potential, an increase in the electrochemical impedance representing the inner layer by 76.8% and the decrease in the corrosion current density by 49.6%. This is an effective and environment-friendly technique to clean and passivate rebars and similar steel materials.
Simultaneous imaging/reflectivity measurements to assess diagnostic mirror cleaning.
Skinner, C H; Gentile, C A; Doerner, R
2012-10-01
Practical methods to clean ITER's diagnostic mirrors and restore reflectivity will be critical to ITER's plasma operations. We describe a technique to assess the efficacy of mirror cleaning techniques and detect any damage to the mirror surface. The method combines microscopic imaging and reflectivity measurements in the red, green, and blue spectral regions and at selected wavelengths. The method has been applied to laser cleaning of single crystal molybdenum mirrors coated with either carbon or beryllium films 150-420 nm thick. It is suitable for hazardous materials such as beryllium as the mirrors remain sealed in a vacuum chamber.
Cobalt and iron segregation and nitride formation from nitrogen plasma treatment of CoFeB surfaces
NASA Astrophysics Data System (ADS)
Mattson, E. C.; Michalak, D. J.; Veyan, J. F.; Chabal, Y. J.
2017-02-01
Cobalt-iron-boron (CoFeB) thin films are the industry standard for ferromagnetic layers in magnetic tunnel junction devices and are closely related to the relevant surfaces of CoFe-based catalysts. Identifying and understanding the composition of their surfaces under relevant processing conditions is therefore critical. Here we report fundamental studies on the interaction of nitrogen plasma with CoFeB surfaces using infrared spectroscopy, x-ray photoemission spectroscopy, and low energy ion scattering. We find that, upon exposure to nitrogen plasma, clean CoFeB surfaces spontaneously reorganize to form an overlayer comprised of Fe2N3 and BN, with the Co atoms moved well below the surface through a chemically driven process. Subsequent annealing to 400 °C removes nitrogen, resulting in a Fe-rich termination of the surface region.
NASA Astrophysics Data System (ADS)
Wang, Junqiang; Wang, Qian; Wu, Zijian; Tan, Lin; Cai, Jian; Wang, Dejun
2017-05-01
A novel pretreatment of plasma combined self-assembled monolayer (PcSAM) was proposed to improve surface properties of electroplated Cu for low temperature Cu-Sn bonding in 3D integration. Measurement results revealed that self-assemble monolayer (SAM) would be easier absorbed on plasma-activated Cu surface and protect the clean surface from re-oxidation when storage. The absorbed SAM layer could be removed by thermal desorption during bonding process. With optimal PcSAM pretreatment, oxygen content of the Cu surface was reduced to as low as 1.39%. The followed Cu-Sn bonding was realized at low temperature of 200 °C. Finally, bonding interface exhibited a defect-free interconnection, and bonding strength has reached as high as 68.7 MPa.
NASA Astrophysics Data System (ADS)
Gururaj, T.; Subasri, R.; Raju, K. R. C. Soma; Padmanabham, G.
2011-02-01
An attempt was made to study the effect of plasma surface activation on the adhesion of UV-curable sol-gel coatings on polycarbonate (PC) and polymethylmethacrylate (PMMA) substrates. The sol was synthesized by the hydrolysis and condensation of a UV-curable silane in combination with Zr-n-propoxide. Coatings deposited by dip coating were cured using UV-radiation followed by thermal curing between 80 °C and 130 °C. The effect of plasma surface treatment on the wettability of the polymer surface prior to coating deposition was followed up by measuring the water contact angle. The water contact angle on the surface of as-cleaned substrates was 80° ± 2° and that after plasma treatment was 43° ± 1° and 50° ± 2° for PC and PMMA respectively. Adhesion as well as mechanical properties like scratch resistance and taber abrasion resistance were evaluated for coatings deposited over plasma treated and untreated surfaces.
Code of Federal Regulations, 2013 CFR
2013-07-01
... this definition. (1) In situ plasma process sub-type consists of the cleaning of thin-film production... within a broad process type. For example, the chamber cleaning process type includes in-situ plasma chamber cleaning, remote plasma chamber cleaning, and in-situ thermal chamber cleaning sub-types. Process...
Code of Federal Regulations, 2012 CFR
2012-07-01
... this definition. (1) In situ plasma process sub-type consists of the cleaning of thin-film production... within a broad process type. For example, the chamber cleaning process type includes in-situ plasma chamber cleaning, remote plasma chamber cleaning, and in-situ thermal chamber cleaning sub-types. Process...
Code of Federal Regulations, 2014 CFR
2014-07-01
... definition. (1) In situ plasma process sub-type consists of the cleaning of thin-film production chambers... within a broad process type. For example, the chamber cleaning process type includes in-situ plasma chamber cleaning, remote plasma chamber cleaning, and in-situ thermal chamber cleaning sub-types. Process...
NASA Astrophysics Data System (ADS)
Škoro, Nikola; Puač, Nevena; Lazović, Saša; Cvelbar, Uroš; Kokkoris, George; Gogolides, Evangelos
2013-11-01
In this paper we present results of measurements and global modelling of low-pressure inductively coupled H2 plasma which is suitable for surface cleaning applications. The plasma is ignited at 1 Pa in a helicon-type reactor and is characterized using optical emission measurements (optical actinometry) and electrical measurements, namely Langmuir and catalytic probe. By comparing catalytic probe data obtained at the centre of the chamber with optical actinometry results, an approximate calibration of the actinometry method as a semi-quantititative measure of H density was achieved. Coefficients for conversion of actinometric ratios to H densities are tabulated and provided. The approximate validity region of the simple actinometry formula for low-pressure H2 plasma is discussed in the online supplementary data (stacks.iop.org/JPhysD/46/475206/mmedia). Best agreement with catalytic probe results was obtained for (Hβ, Ar750) and (Hβ, Ar811) actinometric line pairs. Additionally, concentrations of electrons and ions as well as plasma potential, electron temperature and ion fluxes were measured in the chamber centre at different plasma powers using a Langmuir probe. Moreover, a global model of an inductively coupled plasma was formulated using a compiled reaction set for H2/Ar gas mixture. The model results compared reasonably well with the results on H atom and charge particle densities and a sensitivity analysis of important input parameters was conducted. The influence of the surface recombination, ionization, and dissociation coefficients, and the ion-neutral collision cross-section on model results was demonstrated.
NASA Technical Reports Server (NTRS)
Pickett, Lorri A. (Editor)
1995-01-01
Topics covered include: Risk assessment of hazardous materials, Automated systems for pollution prevention and hazardous materials elimination, Study design for the toxicity evaluation of ammonium perchlorate, Plasma sprayed bondable stainless surface coatings, Development of CFC-free cleaning processes, New fluorinated solvent alternatives to ozone depleting solvents, Cleaning with highly fluorinated liquids, Biotreatment of propyleneglycol nitrate by anoxic denitrification, Treatment of hazardous waste with white rot fungus, Hydrothermal oxidation as an environmentally benign treatment technology, Treatment of solid propellant manufacturing wastes by base hydrolysis, Design considerations for cleaning using supercritical fluid technology, and Centrifugal shear carbon dioxide cleaning.
Tong, Wei; Tran, Phong A; Turnley, Ann M; Aramesh, Morteza; Prawer, Steven; Brandt, Milan; Fox, Kate
2016-04-01
Diamond has shown great potential in different biomedical applications, but the effects of sterilization on its properties have not been investigated. Here, we studied the influence of five sterilization techniques (solvent cleaning, oxygen plasma, UV irradiation, autoclave and hydrogen peroxide) on nitrogen-included ultrananocrystalline diamond. The chemical modification of the diamond surface was evaluated using X-ray photoelectron spectroscopy and water contact angle measurements. Different degrees of surface oxidation and selective sp(2) bonded carbon etching were found following all sterilization techniques, resulting in an increase of hydrophilicity. Higher viabilities of in vitro mouse 3T3 fibroblasts and rat cortical neuron cells were observed on oxygen plasma, autoclave and hydrogen peroxide sterilized diamond, which correlated with their higher hydrophilicity. By examination of apatite formation in simulated body fluid, in vivo bioactivity was predicted to be best on those surfaces which have been oxygen plasma treated and lowest on those which have been exposed to UV irradiation. The charge injection properties were also altered by the sterilization process and there appears to be a correlation between these changes and the degree of oxygen termination of the surface. We find that the modification brought by autoclave, oxygen plasma and hydrogen peroxide were most consistent with the use of N-UNCD in biological applications as compared to samples sterilized by solvent cleaning or UV exposure or indeed non-sterilized. A two-step process of sterilization by hydrogen peroxide following oxygen plasma treatment was then suggested. However, the final choice of sterilization technique will depend on the intended end application. Copyright © 2015 Elsevier B.V. All rights reserved.
Yahia, L H; Lombardi, S; Piron, D; Klemberg-Sapieha, J E; Wertheimer, M R
NiTi alloy specimens were plasma cleaned and then coated with a thin film of plasma-polymerized tetrafluoroethylene (TFE) in a Radio-Frequency reactor. The corrosion protection provided by these films was studied by potentiodynamic tests performed in Hank's physiological solution. Surface properties which determine biocompatibility were characterized by X-ray photoelectron spectroscopy (XPS). The results showed that the surface of untreated NiTi was mostly composed by oxygen, carbon, titanium oxide (TiO2) with traces of nickel oxides (NiO and Ni2O3) and metallic Ni. The passivity of untreated NiTi was found to be unstable in the simulated human body media. After plasma treatment, the NiTi surface contained only carbon and fluor. The plasma-polymerized thin film was found to stabilize the NiTi passivity and to increase its pitting potential. This treatment provides a good protection against dissolution of nickel from NiTi alloys.
Douglas, Erica A.; Sheng, Josephine J.; Verley, Jason C.; ...
2015-06-04
We found that the demand for integration of near infrared optoelectronic functionality with silicon complementary metal oxide semiconductor (CMOS) technology has for many years motivated the investigation of low temperature germanium on silicon deposition processes. Our work describes the development of a high density plasma chemical vapor deposition process that uses a low temperature (<460 °C) in situ germane/argon plasma surface preparation step for epitaxial growth of germanium on silicon. It is shown that the germane/argon plasma treatment sufficiently removes SiO x and carbon at the surface to enable germanium epitaxy. Finally, the use of this surface preparation step demonstratesmore » an alternative way to produce germanium epitaxy at reduced temperatures, a key enabler for increased flexibility of integration with CMOS back-end-of-line fabrication.« less
Cleaning procedure for improved photothermal background of toroidal optical microresonators
NASA Astrophysics Data System (ADS)
Horak, Erik H.; Knapper, Kassandra A.; Heylman, Kevin D.; Goldsmith, Randall H.
2016-09-01
High Q-factors and small mode volumes have made toroidal optical microresonators exquisite sensors to small shifts in the effective refractive index of the WGM modes. Eliminating contaminants and improving quality factors is key for many different sensing techniques, and is particularly important for photothermal imaging as contaminants add photothermal background obscuring objects of interest. Several different cleaning procedures including wet- and dry-chemical procedures are tested for their effect on Q-factors and photothermal background. RCA cleaning was shown to be successful in contrast to previously described acid cleaning procedures, most likely due to the different surface reactivity of the acid reagents used. UV-ozone cleaning was shown to be vastly superior to O2 plasma cleaning procedures, significantly reducing the photothermal background of the resonator.
Alternative Solvents through Green Chemistry Project
NASA Technical Reports Server (NTRS)
Hintze, Paul E.; Quinn, Jacqueline
2014-01-01
Components in the aerospace industry must perform with accuracy and precision under extreme conditions, and surface contamination can be detrimental to the desired performance, especially in cases when the components come into contact with strong oxidizers such as liquid oxygen. Therefore, precision cleaning is an important part of a components preparation prior to utilization in aerospace applications. Current cleaning technologies employ a variety of cleaning agents, many of which are halogenated solvents that are either toxic or cause environmental damage. Thus, this project seeks to identify alternative precision cleaning solvents and technologies, including use of less harmful cleaning solvents, ultrasonic and megasonic agitation, low-pressure plasma cleaning techniques, and supercritical carbon dioxide extraction. Please review all data content found in the Public Data tab located at: https:techport.nasa.govview11697public
Shiely, F; Fallon, D; Casey, C; Kerins, D M; Eustace, J A
2017-02-01
In routine clinical practice, mattresses are manually cleaned using specialised cleaning and high-level disinfecting fluids. While effective against a wide range of organisms, the success of this approach is dependent on a thorough and complete application and is likely to be susceptible to human error and thus variable. The efficacy of available infection control measures to reduce such mattress contamination is unknown as it is not subject to quality control measures. There is a pressing need to identify more effective methods to prevent cross contamination within the medical environment, given the lack of available treatment strategies. The purpose of this study is to investigate the ability of a new technology, gaseous technology, to reduce colonization levels, compared to standard cleaning, and so attenuate superficial nosocomial infections. We conducted a prospective, single-centre, open-label, non-randomized trial with blinded outcome assessments, comparing the standard cleaning of hospital mattresses with a novel plasma based disinfection system Radica™, followed by a standard post-cleaning culturing protocol (five swabs/mattress). The median (interquartile range) maximal colony count per mattress for the 20 Radica versus 7 routinely cleaned mattresses was 1 (1-2.7) versus Too-Numerous-to-Count (TNTC) (32-TNTC), respectively, p = 0.002. Of the 20 Radica™ treated mattresses, 12 (60 %) had no positive culture result while all of the standard cleaned mattresses had at least two positive cultures. The plasma based Radica disinfection system reduces mattress bacterial colonization levels as compared to routine cleaning. This is a potentially important technology in the health care system to reduce surface colonisation and hence nosocomial infections.
Studies of EUV contamination mitigation
NASA Astrophysics Data System (ADS)
Graham, Samual, Jr.; Malinowski, Michael E.; Steinhaus, Chip; Grunow, Philip A.; Klebanoff, Leonard E.
2002-07-01
Carbon contamination removal was investigated using remote RF-O2, RF-H2, and atomic hydrogen experiments. Samples consisted of silicon wafers coated with 100 Angstrom sputtered carbon, as well as bare Si-capped Mo/Si optics. Samples were exposed to atomic hydrogen or RF plasma discharges at 100 W, 200 W, and 300 W. Carbon removal rate, optic oxidation rate, at-wavelength (13.4 nm) peak reflectance, and optic surface roughness were characterized. Data show that RF- O2 removes carbon at a rate approximately 6 times faster RF- H2 for a given discharge power. However, both cleaning techniques induce Mo/Si optic degradation through the loss of reflectivity associated with surface oxide growth for RF-O2 and an unknown mechanism with hydrogen cleaning. Atomic hydrogen cleaning shows carbon removal rates sufficient for use as an in-situ cleaning strategy for EUVoptics with less risk of optic degradation from overexposures than RF-discharge cleaning. While hydrogen cleaning (RF and atomic) of EUV optics has proven effective in carbon removal, attempts to dissociate hydrogen in co-exposures with EUV radiation have resulted in no detectable removal of carbon contamination.
NASA Astrophysics Data System (ADS)
Tinck, S.; Boullart, W.; Bogaerts, A.
2011-08-01
In this paper, simulations are performed to gain a better insight into the properties of a Cl2/Ar plasma, with and without O2, during plasma etching of Si. Both plasma and surface properties are calculated in a self-consistent manner. Special attention is paid to the behavior of etch products coming from the wafer or the walls, and how the chamber walls can affect the plasma and the resulting etch process. Two modeling cases are considered. In the first case, the reactor walls are defined as clean (Al2O3), whereas in the second case a SiO2 coating is introduced on the reactor walls before the etching process, so that oxygen will be sputtered from the walls and introduced into the plasma. For this reason, a detailed reaction set is presented for a Cl2/O2/Ar plasma containing etched species, as well as an extensive reaction set for surface processes, including physical and chemical sputtering, chemical etching and deposition processes. Density and flux profiles of various species are presented for a better understanding of the bulk plasma during the etching process. Detailed information is also given on the composition of the surfaces at various locations of the reactor, on the etch products in the plasma and on the surface loss probabilities of the plasma species at the walls, with different compositions. It is found that in the clean chamber, walls are mostly chlorinated (Al2Cl3), with a thin layer of etch products residing on the wall. In the coated chamber, an oxy-chloride layer is grown on the walls for a few nanometers during the etching process. The Cl atom wall loss probability is found to decrease significantly in the coated chamber, hence increasing the etch rate. SiCl2, SiCl4 and SiCl3 are found to be the main etch products in the plasma, with the fraction of SiCl2 being always slightly higher. The simulation results compare well with experimental data available from the literature.
The Selective Epitaxy of Silicon at Low Temperatures.
NASA Astrophysics Data System (ADS)
Lou, Jen-Chung
1991-01-01
This dissertation has developed a process for the selective epitaxial growth (SEG) of silicon at low temperatures using a dichlorosilane-hydrogen mixture in a hot-wall low pressure chemical vapor deposition (LPCVD) reactor. Some basic issues concerning the quality of epilayers --substrate preparation, ex-situ and in-situ cleaning, and deposition cycle, have been studied. We find it necessary to use a plasma etch to open epitaxial windows for the SEG of Si. A cycled plasma etch, a thin sacrificial oxide growth, and an oxide etching step can completely remove plasma-etch-induced surface damage and contaminants, which result in high quality epilayers. A practical wafer cleaning step is developed for low temperature Si epitaxial growth. An ex-situ HF vapor treatment can completely remove chemical oxide from the silicon surface and retard the reoxidation of the silicon surface. An in-situ low-concentration DCS cycle can aid in decomposition of surface oxide during a 900 ^circC H_2 prebake step. An HF vapor treatment combined with a low-concentration of DCS cycle consistently achieves defect-free epilayers at 850^circC and lower temperatures. We also show that a BF_sp{2}{+ } or F^+ ion implantation is a potential ex-situ wafer cleaning process for SEG of Si at low temperatures. The mechanism for the formation of surface features on Si epilayers is also discussed. Based on O ^+ ion implantation, we showed that the oxygen incorporation in silicon epilayers suppresses the Si growth rate. Therefore, we attribute the formation of surface features to the local reduction of the Si growth rate due to the dissolution of oxide islands at the epi/substrate interface. Finally, with this developed process for the SEG of silicon, defect-free overgrown epilayers are also obtained. This achievement demonstrates the feasibility for the future silicon-on-oxide (SOI) manufacturing technology.
Amornsudthiwat, Phakdee; Nitschke, Mirko; Zimmermann, Ralf; Friedrichs, Jens; Grundke, Karina; Pöschel, Kathrin; Damrongsakkul, Siriporn; Werner, Carsten
2015-06-21
The study aims at a comprehensive surface characterization of untreated and oxygen plasma-treated silk fibroin with a particular focus on phenomena relevant to biointeraction and cell adhesion. For that purpose, a range of advanced surface diagnostic techniques is employed to thoroughly investigate well-defined and especially clean silk fibroin samples in a comparable setting. This includes surface chemistry and surface charges as factors, which control protein adsorption, but also hydration and swelling of the material as important parameters, which govern the mechanical stiffness at the interface with aqueous media. Oxygen plasma exposure of silk fibroin surfaces reveals that material ablation strongly predominates over the introduction of functional groups even for mild plasma conditions. A substantial increase in mechanical stiffness is identified as the most prominent effect upon this kind of plasma treatment. Regarding the experimental approach and the choice of techniques, the work goes beyond previous studies in this field and paves the way for well-founded investigations of other surface-selective modification procedures that enhance the applicability of silk fibroin in biomedical applications.
Canullo, Luigi; Peñarrocha-Oltra, David; Marchionni, Silvia; Bagán, Leticia; Micarelli, Costanza
2014-01-01
Objectives: A randomized controlled trial was performed to assess soft tissue cell adhesion to implant titanium abutments subjected to different cleaning procedures and test if plasma cleaning can enhance cell adhesion at an early healing time. Study Design: Eighteen patients with osseointegrated and submerged implants were included. Before re-opening, 18 abutments were divided in 3 groups corresponding to different clinical conditions with different cleaning processes: no treatment (G1), laboratory customization and cleaning by steam (G2), cleaning by plasma of Argon (G3). Abutments were removed after 1 week and scanning electron microscopy was used to analyze cell adhesion to the abutment surface quantitatively (percentage of area occupied by cells) and qualitatively (aspect of adhered cells and presence of contaminants). Results: Mean percentages of area occupied by cells were 17.6 ± 22.7%, 16.5 ± 12.9% and 46.3 ± 27.9% for G1, G2 and G3 respectively. Differences were statistically significant between G1 and G3 (p=0.030), close to significance between G2 and G3 (p=0.056), and non-significant between G1 and G2 (p=0.530). The proportion of samples presenting adhered cells was homogeneous among the 3 groups (p-valor = 1.000). In all cases cells presented a flattened aspect; in 2 cases cells were less efficiently adhered and in 1 case cells presented filipodia. Three cases showed contamination with cocobacteria. Conclusions: Within the limits of the present study, plasma of Argon may enhance cell adhesion to titanium abutments, even at the early stage of soft tissue healing. Further studies with greater samples are necessary to confirm these findings. Key words:Connective tissue, dental abutments, randomized controlled trial, clinical research, glow discharged abutment, plasma cleaning. PMID:24121917
Atmospheric plasma generation for LCD panel cleaning
NASA Astrophysics Data System (ADS)
Kim, Gyu-Sik; Won, Chung-Yuen; Choi, Ju-Yeop; Yim, C. H.
2007-12-01
UV lamp systems have been used for cleaning of display panels of TFT LCD or Plasma Display Panel (PDP). However, the needs for high efficient cleaning and low cost made high voltage plasma cleaning techniques to be developed and to be improved. Dielectric-barrier discharges (DBDs), also referred to as barrier discharges or silent discharges have for a long time been exclusively related to ozone generation. In this paper, a 6kW high voltage plasma power supply system was developed for LCD cleaning. The -phase input voltage is rectified and then inverter system is used to make a high frequency pulse train, which is rectified after passing through a high-power transformer. Finally, bi-directional high voltage pulse switching circuits are used to generate the high voltage plasma. Some experimental results showed the usefulness of atmospheric plasma for LCD panel cleaning.
Sterilization of bacterial endospores by an atmospheric-pressure argon plasma jet
DOE Office of Scientific and Technical Information (OSTI.GOV)
Uhm, Han S.; Lim, Jin P.; Li, Shou Z.
2007-06-25
Argon plasma jets penetrate deep into ambient air and create a path for oxygen radicals to sterilize microbes. A sterilization experiment with bacterial endospores indicates that an argon-oxygen plasma jet very effectively kills endospores of Bacillus atrophaeus (ATCC 9372), thereby demonstrating its capability to clean surfaces and its usefulness for reinstating contaminated equipment as free from toxic biological warfare agents. However, the spore-killing efficiency of the atmospheric-pressure argon-oxygen jet depends very sensitively on the oxygen concentration in the argon gas.
Surface cleaning for enhanced adhesion to packaging surfaces: Effect of oxygen and ammonia plasma
DOE Office of Scientific and Technical Information (OSTI.GOV)
Gaddam, Sneha; Dong, Bin; Driver, Marcus
2015-03-15
The effects of direct plasma chemistries on carbon removal from silicon nitride (SiN{sub x}) and oxynitride (SiO{sub x}N{sub y}) surfaces have been studied by in-situ x-ray photoelectron spectroscopy (XPS) and ex-situ contact angle measurements. The data indicate that O{sub 2} and NH{sub 3} capacitively coupled plasmas are effective at removing adventitious carbon from silicon nitride (SiN{sub x}) and Si oxynitride (SiO{sub x}N{sub y}) surfaces. O{sub 2} plasma treatment results in the formation of a silica overlayer. In contrast, the exposure to NH{sub 3} plasma results in negligible additional oxidation of the SiN{sub x} or SiO{sub x}N{sub y} surface. Ex-situ contactmore » angle measurements show that SiN{sub x} and SiO{sub x}N{sub y} surfaces exposed to oxygen plasma are initially more hydrophilic than surfaces exposed to NH{sub 3} plasma, indicating that the O{sub 2} plasma-induced SiO{sub 2} overlayer is highly reactive toward ambient. At longer ambient exposures (≳10 h), however, surfaces treated by either O{sub 2} or NH{sub 3} plasma exhibit similar steady state contact angles, correlated with rapid uptake of adventitious carbon, as determined by XPS. Surface passivation by exposure to molecular hydrogen prior to ambient exposure significantly retards the increase in contact angle upon exposure to ambient. The results suggest a practical route to enhancing the time available for effective bonding to surfaces in microelectronics packaging applications.« less
Surface analysis of 316 stainless steel treated with cold atmospheric plasma
NASA Astrophysics Data System (ADS)
Williams, David F.; Kellar, Ewen J. C.; Jesson, David A.; Watts, John F.
2017-05-01
The surface of 316 stainless steel has been modified using cold atmospheric plasma (CAP) to increase the surface free energy (by cleaning the and chemically activating the surface)IN preparation for subsequent processes such as painting, coating or adhesive bonding. The analyses carried out, on CAP treated 316 stainless steel surfaces, includes X-ray photoelectron spectroscopy (XPS), imaging XPS (iXPS), and surface free energy (SFE) analysis using contact angle measurements. The CAP treatment is shown to increase the SFE of as-received 316 stainless steel from ∼39 mJ m-1 to >72 mJ m-1 after a short exposure to the plasma torch. This was found to correlate to a reduction in adventitious carbon, as determined by XPS analysis of the surface. The reduction from ∼90 at% to ∼30% and ∼39 at%, after being plasma treated for 5 min and 15 s respectively, shows that the process is relatively quick at changing the surface. It is suggested that the mechanism that causes the increase in surface free energy is chain scission of the hydrocarbon contamination triggered by free electrons in the plasma plume followed by chemical functionalisation of the metal oxide surface and some of the remaining carbon contamination layer.
Can tokamaks PFC survive a single event of any plasma instabilities?
NASA Astrophysics Data System (ADS)
Hassanein, A.; Sizyuk, V.; Miloshevsky, G.; Sizyuk, T.
2013-07-01
Plasma instability events such as disruptions, edge-localized modes (ELMs), runaway electrons (REs), and vertical displacement events (VDEs) are continued to be serious events and most limiting factors for successful tokamak reactor concept. The plasma-facing components (PFCs), e.g., wall, divertor, and limited surfaces of a tokamak as well as coolant structure materials are subjected to intense particle and heat loads and must maintain a clean and stable surface environment among them and the core/edge plasma. Typical ITER transient events parameters are used for assessing the damage from these four different instability events. HEIGHTS simulation showed that a single event of a disruption, giant ELM, VDE, or RE can cause significant surface erosion (melting and vaporization) damage to PFC, nearby components, and/or structural materials (VDE, RE) melting and possible burnout of coolant tubes that could result in shut down of reactor for extended repair time.
NASA Technical Reports Server (NTRS)
Hintze, Paul E.
2016-01-01
NASA's Kennedy Space Center has developed two solvent-free precision cleaning techniques: plasma cleaning and supercritical carbon dioxide (SCCO2), that has equal performance, cost parity, and no environmental liability, as compared to existing solvent cleaning methods.
NASA Astrophysics Data System (ADS)
Ostrikov, Kostya
2010-11-01
This presentation focuses on the plasma issues related to the solution of the grand challenge of directing energy and matter at nanoscales. This ability is critical for the renewable energy and energy-efficient technologies for sustainable future development. It will be discussed how to use environmentally and human health benign non-equilibrium plasma-solid systems and control the elementary processes of plasma-surface interactions to direct the fluxes of energy and matter at multiple temporal and spatial scales. In turn, this makes it possible to achieve the deterministic synthesis of self- organised arrays of metastable nanostructures in the size range beyond the reach of the present-day nanofabrication. Such structures have tantalising prospects to enhance performance of nanomaterials in virtually any area of human activity yet remain almost inaccessible because the Nature's energy minimisation rules allow only a small number of stable equilibrium states. By using precisely controlled and kinetically fast nanoscale transfer of energy and matter under non-equilibrium conditions and harnessing numerous plasma- specific controls of species creation, delivery to the surface, nucleation and large-scale self-organisation of nuclei and nanostructures, the arrays of metastable nanostructures can be created, arranged, stabilised, and further processed to meet the specific requirements of the envisaged applications. These approaches will eventually lead to faster, unprecedentedly- clean, human-health-friendly, and energy-efficient nanoscale synthesis and processing technologies for the next-generation renewable energy and light sources, biomedical devices, information and communication systems, as well as advanced functional materials for applications ranging from basic food, water, health and clean environment needs to national security and space missions.
Baking and helium glow discharge cleaning of SST-1 Tokamak with graphite plasma facing components
NASA Astrophysics Data System (ADS)
Semwal, P.; Khan, Z.; Raval, D. C.; Dhanani, K. R.; George, S.; Paravastu, Y.; Prakash, A.; Thankey, P.; Ramesh, G.; Khan, M. S.; Saikia, P.; Pradhan, S.
2017-04-01
Graphite plasma facing components (PFCs) were installed inside the SST-1 vacuum vessel. Prior to installation, all the graphite tiles were baked at 1000 °C in a vacuum furnace operated below 1.0 × 10-5 mbar. However due to the porous structure of graphite, they absorb a significant amount of water vapour from air during the installation process. Rapid desorption of this water vapour requires high temperature bake-out of the PFCs at ≥ 250 °C. In SST-1 the PFCs were baked at 250 °C using hot nitrogen gas facility to remove the absorbed water vapour. Also device with large graphite surface area has the disadvantage that a large quantity of hydrogen gets trapped inside it during plasma discharges which makes density control difficult. Helium glow discharge cleaning (He-GDC) effectively removes this stored hydrogen as well as other impurities like oxygen and hydrocarbon within few nano-meters from the surface by particle induced desorption. Before plasma operation in SST-1 tokamak, both baking of PFCs and He-GDC were carried out so that these impurities were removed effectively. The mean desorption yield of hydrogen was found to be 0.24. In this paper the results of baking and He-GDC experiments of SST-1 will be presented in detail.
Optimization and analysis of NF3 in situ chamber cleaning plasmas
NASA Astrophysics Data System (ADS)
Ji, Bing; Yang, James H.; Badowski, Peter R.; Karwacki, Eugene J.
2004-04-01
We report on the optimization and analysis of a dilute NF3 in situ plasma-enhanced chemical vapor deposition chamber cleaning plasma for an Applied Materials P-5000 DxL chamber. Using design of experiments methodology, we identified and optimized operating conditions within the following process space: 10-15 mol % NF3 diluted with helium, 200-400 sccm NF3 flow rate, 2.5-3.5 Torr chamber pressure, and 950 W rf power. Optical emission spectroscopy and Fourier transform infrared spectroscopy were used to endpoint the cleaning processes and to quantify plasma effluent emissions, respectively. The results demonstrate that dilute NF3-based in situ chamber cleaning can be a viable alternative to perfluorocarbon-based in situ cleans with added benefits. The relationship between chamber clean time and fluorine atom density in the plasma is also investigated.
Application of atmospheric pressure plasma in polymer and composite adhesion
NASA Astrophysics Data System (ADS)
Yu, Hang
An atmospheric pressure helium and oxygen plasma was used to investigate surface activation and bonding in polymer composites. This device was operated by passing 1.0-3.0 vol% of oxygen in helium through a pair of parallel plate metal electrodes powered by 13.56 or 27.12 MHz radio frequency power. The gases were partially ionized between the capacitors where plasma was generated. The reactive species in the plasma were carried downstream by the gas flow to treat the substrate surface. The temperature of the plasm gas reaching the surface of the substrate did not exceed 150 °C, which makes it suitable for polymer processing. The reactive species in the plasma downstream includes ~ 1016-1017 cm-3 atomic oxygen, ~ 1015 cm-3 ozone molecule, and ~ 10 16 cm-3 metastable oxygen molecule (O2 1Deltag). The substrates were treated at 2-5 mm distance from the exit of the plasma. Surface properties of the substrates were characterized using water contact angle (WCA), atomic force microscopy (AFM), infrared spectroscopy (IR), and X-ray photoelectron spectroscopy (XPS). Subsequently, the plasma treated samples were bonded adhesively or fabricated into composites. The increase in mechanical strength was correlated to changes in the material composition and structure after plasma treatment. The work presented hereafter establishes atmospheric pressure plasma as an effective method to activate and to clean the surfaces of polymers and composites for bonding. This application can be further expanded to the activation of carbon fibers for better fiber-resin interactions during the fabrication of composites. Treating electronic grade FR-4 and polyimide with the He/O2 plasma for a few seconds changed the substrate surface from hydrophobic to hydrophilic, which allowed complete wetting of the surface by epoxy in underfill applications. Characterization of the surface by X-ray photoelectron spectroscopy shows formation of oxygenated functional groups, including hydroxyl, carbonyl, and carboxyl groups, on the polymer surface after plasma treatment. The resulting strength of the bond based on lap-shear and T-peel tests correlates well with the concentration of oxygen on the polymer surface. The failure modes observed for lap-shear and T-peel tests changed from interfacial to cohesive after the plasma activation. Treating carbon-fiber-reinforced epoxy composites with the atmospheric plasma resulted in the removal of fluorinated contaminants in shallow surface layers. For contaminants that diffused deeply into the composite surface, mechanical abrasion was needed in addition to the plasma treatment to remove the impurities. While cleaning the composite, plasma also generated active oxygen groups on the substrate surface. The presence of these groups improved the adhesive bonding strength of the composite even in the presence of residual fluorine contaminants. Thus, it was speculated that plasma treatment can promote better polymer adhesion with or without fluorine contamination. Carbon nanotube sheets were also treated by the helium oxygen plasma, and the CNT surface turn from super hydrophobic to hydrophilic after a few seconds of exposure. The nanotube surface contained 15% of oxygen in the form of hydroxyl groups. Chemical coupling agents were added to the plasma activated CNT surfaces in order to crosslink the CNTs and to create bonding sites for the resin matrix. Stretched, activated and functionalized CNT was cured with dicyclopentadiene (DCPD) to produce a sheet composite with a tensile strength of 636 MPa, a modulus of 28 GPa, and a density of 1.4 g/cm 3. This may be compared to aerospace-grade aluminum with tensile strength of 572 MPa, modulus of 72 GPa, and density of 2.7 g/cm3. This work demonstrates that new high-strength composite can be produced with the use of atmospheric plasma activation and chemical crosslinking of the fiber matrix.
Dey, Tania; Naughton, Daragh
2017-05-01
Glass surface cleaning is the very first step in advanced coating deposition and it also finds use in conserving museum objects. However, most of the wet chemical methods of glass cleaning use toxic and corrosive chemicals like concentrated sulfuric acid (H 2 SO 4 ), piranha (a mixture of concentrated sulfuric acid and 30% hydrogen peroxide), and hydrogen fluoride (HF). On the other hand, most of the dry cleaning techniques like UV-ozone, plasma, and laser treatment require costly instruments. In this report, five eco-friendly wet chemical methods of glass cleaning were evaluated in terms of contact angle (measured by optical tensiometer), nano-scale surface roughness (measured by atomic force microscopy or AFM), and elemental composition (measured by energy dispersive x-ray spectroscopy or SEM-EDX). These glass cleaning methods are devoid of harsh chemicals and costly equipment, hence can be applied in situ in close proximity with plantation such as greenhouse or upon subtle objects such as museum artifacts. Out of these five methods, three methods are based on the chemical principle of chelation. It was found that the citric acid cleaning method gave the greatest change in contact angle within the hydrophilic regime (14.25° for new glass) indicating effective cleansing and the least surface roughness (0.178 nm for new glass) indicating no corrosive effect. One of the glass sample showed unique features which were traced backed to the history of the glass usage.
Ebert, Daniel; Bhushan, Bharat
2016-11-01
Surfaces that simultaneously exhibit superhydrophobicity, low contact angle hysteresis, and high transmission of visible light are of interest for many applications, such as optical devices, solar panels, and self-cleaning windows. Superhydrophobicity could also find use in medical devices where antifouling characteristics are desirable. These applications also typically require mechanical wear resistance. The fabrication of such surfaces is challenging due to the competing goals of superhydrophobicity and transmittance in terms of the required degree of surface roughness. In this study, deep reactive ion etching (DRIE) was used to create rough surfaces on PDMS substrates using a O2/CF4 plasma. Surfaces then underwent an additional treatment with either octafluorocyclobutane (C4F8) plasma or vapor deposition of perfluorooctyltrichlorosilane (PFOTCS) following surface activation with O2 plasma. The effects of surface roughness and the additional surface modifications were examined with respect to the contact angle, contact angle hysteresis, and optical transmittance. To examine wear resistance, a sliding wear experiment was performed using an atomic force microscope (AFM). Copyright © 2016 Elsevier Inc. All rights reserved.
NASA Astrophysics Data System (ADS)
Ibrahim, Siti Aisyah; Jaafar, Muhammad Musoddiq; Ng, Fong-Lee; Phang, Siew-Moi; Kumar, G. Ghana; Majid, Wan Haliza Abd; Periasamy, Vengadesh
2018-01-01
The surface optimization and structural characteristics of Langmuir-Blodgett (LB) reduced graphene oxide thin (rGO) film treated by argon plasma treatment were studied. In this work, six times deposition of rGO was deposited on a clean glass substrate using the LB method. Plasma technique involving a variation of plasma power, i.e., 20, 60, 100 and 140 W was exposed to the LB-rGO thin films under argon ambience. The plasma treatment generally improves the wettability or hydrophilicity of the film surface compared to without treatment. Maximum wettability was observed at a plasma power of 20 W, while also increasing the adhesion of the rGO film with the glass substrate. The multilayer films fabricated were characterized by means of spectroscopic, structural and electrical studies. The treatment of rGO with argon plasma was found to have improved its biocompatibility, and thus its performance as an electrode for biophotovoltaic devices has been shown to be enhanced considerably.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Barth, Michael; Datta, Suman, E-mail: sdatta@engr.psu.edu; Bruce Rayner, G.
2014-12-01
We investigate in-situ cleaning of GaSb surfaces and its effect on the electrical performance of p-type GaSb metal-oxide-semiconductor capacitor (MOSCAP) using a remote hydrogen plasma. Ultrathin HfO{sub 2} films grown by atomic layer deposition were used as a high permittivity gate dielectric. Compared to conventional ex-situ chemical cleaning methods, the in-situ GaSb surface treatment resulted in a drastic improvement in the impedance characteristics of the MOSCAPs, directly evidencing a much lower interface trap density and enhanced Fermi level movement efficiency. We demonstrate that by using a combination of ex-situ and in-situ surface cleaning steps, aggressively scaled HfO{sub 2}/p-GaSb MOSCAP structuresmore » with a low equivalent oxide thickness of 0.8 nm and efficient gate modulation of the surface potential are achieved, allowing to push the Fermi level far away from the valence band edge high up into the band gap of GaSb.« less
A comparative study on laser induced shock cleaning of radioactive contaminants in air and water
NASA Astrophysics Data System (ADS)
Kumar, Aniruddha; Prasad, Manisha; Bhatt, R. B.; Behere, P. G.; Biswas, D. J.
2018-03-01
Efficient removal of Uranium-di-oxide (UO2) particulates from stainless steel surface was effected by Nd-YAG laser induced plasma shock waves in air as well as in water environment. The propagation velocity of the generated shock wave was measured by employing the photo-acoustic probe deflection method. Monitoring of the alpha activity of the sample with a ZnS (Ag) scintillation detector before and after the laser exposure allowed the estimation of decontamination efficiency defined as the percentage removal of the initial activity. Experiments were carried out to study the effect of laser pulse energy, number of laser exposures, orientation of the sample, the separation between the substrate surface and the onset point of the shock wave on the de-contamination efficiency. The most optimised cleaning was found to occur when the laser beam impinged normally on the sample that was immersed in water and placed at a distance of ∼0.7 mm from the laser focal spot. Analysis of the cleaned surface by optical microscopes established that laser induced shock cleaning in no way altered the surface property. The shock force generated in both air and water has been estimated theoretically and has been found to exceed the Van der Waal's binding force for spherical contaminant particulate.
Simultaneous specimen and stage cleaning device for analytical electron microscope
Zaluzec, Nestor J.
1996-01-01
An improved method and apparatus are provided for cleaning both a specimen stage, a specimen and an interior of an analytical electron microscope (AEM). The apparatus for cleaning a specimen stage and specimen comprising a plasma chamber for containing a gas plasma and an air lock coupled to the plasma chamber for permitting passage of the specimen stage and specimen into the plasma chamber and maintaining an airtight chamber. The specimen stage and specimen are subjected to a reactive plasma gas that is either DC or RF excited. The apparatus can be mounted on the analytical electron microscope (AEM) for cleaning the interior of the microscope.
NASA Astrophysics Data System (ADS)
Borisov, D. P.; Slabodchikov, V. A.; Kuznetsov, V. M.
2017-05-01
The paper presents research results on the adhesion of Si coatings deposited by magnetron sputtering on NiTi substrates after preliminary surface treatment (cleaning and activation) with low-energy ion beams and gas discharge plasma. The adhesion properties of the coatings obtained by two methods are analyzed and compared using data of scratch and spherical abrasion tests.
Chiap, P; Rbeida, O; Christiaens, B; Hubert, Ph; Lubda, D; Boos, K S; Crommen, J
2002-10-25
A new kind of silica-based restricted-access material (RAM) has been tested in pre-columns for the on-line solid-phase extraction (SPE) of basic drugs from directly injected plasma samples before their quantitative analysis by reversed-phase liquid chromatography (LC), using the column switching technique. The outer surface of the porous RAM particlescontains hydrophilic diol groups while sulphonic acid groups are bound to the internal surface, which gives the sorbent the properties of a strong cation exchanger towards low molecular mass compounds. Macromolecules such as proteins have no access to the internal surface of the pre-column due to their exclusion from the pores and are then flushed directly out. The retention capability of this novel packing material has been tested for some hydrophilic basic drugs, such as atropine, fenoterol, ipratropium, procaine, sotalol and terbutaline, used as model compounds. The influence of the composition of the washing liquid on the retention of the analytes in the pre-column has been investigated. The elution profiles of the different compounds and the plasma matrix as well as the time needed for the transfer of the analytes from the pre-column to the analytical column were determined in order to deduce the most suitable conditions for the clean-up step and develop on-line methods for the LC determination of these compounds in plasma. The cationic exchange sorbent was also compared to another RAM, namely RP-18 ADS (alkyl diol silica) sorbent with respect to retention capability towards basic analytes.
Ashraf, Ali; Wu, Yanbin; Wang, Michael C; Aluru, Narayana R; Dastgheib, Seyed A; Nam, SungWoo
2014-11-04
We report the intrinsic water contact angle (WCA) of multilayer graphene, explore different methods of cleaning multilayer graphene, and evaluate the efficiency of those methods on the basis of spectroscopic analysis. Highly ordered pyrolytic graphite (HOPG) was used as a model material system to study the wettability of the multilayer graphene surface by WCA measurements. A WCA value of 45° ± 3° was measured for a clean HOPG surface, which can serve as the intrinsic WCA for multilayer graphene. A 1 min plasma treatment (100 W) decreased the WCA to 6°, owing to the creation of surface defects and functionalization by oxygen-containing groups. Molecular dynamics simulations of water droplets on the HOPG surface with or without the oxygen-containing defect sites confirmed the experimental results. Heat treatment at near atmospheric pressure and wet chemical cleaning methods using hydrofluoric acid and chloroform did not change the WCA significantly. Low-pressure, high-temperature annealing under argon and hydrogen reduced the WCA to 54°, close to the intrinsic WCA of HOPG. Raman spectroscopy and atomic force microscopy did not show any significant change for the HOPG surface after this treatment, confirming low-pressure, high-temperature annealing as an effective technique to clean multilayer graphene without damaging the surface. Time-of-flight secondary ion mass spectrometry indicated the existence of hydrocarbon species on the surface of the HOPG sample that was exposed to air for <5 min and the absence of these impurities in the bulk. X-ray photoelectron spectroscopy analyses of the sample surfaces after the different cleaning techniques were performed to correlate the WCA to the surface chemistry. X-ray photoelectron spectroscopy results revealed that the WCA value changed drastically, depending on the amounts of oxygen-containing and hydrocarbon-containing groups on the surface.
Strategies to improve the adhesion of rubbers to adhesives by means of plasma surface modification
NASA Astrophysics Data System (ADS)
Martín-Martínez, J. M.; Romero-Sánchez, M. D.
2006-05-01
The surface modifications produced by treatment of a synthetic sulfur vulcanized styrene-butadiene rubber with oxidizing (oxygen, air, carbon dioxide) and non oxidizing (nitrogen, argon) RF low pressure plasmas, and by treatment with atmospheric plasma torch have been assessed by ATR-IR and XPS spectroscopy, SEM, and contact angle measurements. The effectiveness of the low pressure plasma treatment depended on the gas atmosphere used to generate the plasma. A lack of relationship between surface polarity and wettability, and peel strength values was obtained, likely due to the cohesive failure in the rubber obtained in the adhesive joints. In general, acceptable adhesion values of plasma treated rubber were obtained for all plasmas, except for nitrogen plasma treatment during 15 minutes due to the creation of low molecular weight moieties on the outermost rubber layer. A toluene wiping of the N{2 } plasma treated rubber surface for 15 min removed those moieties and increased adhesion was obtained. On the other hand, the treatment of the rubber with atmospheric pressure by means of a plasma torch was proposed. The wettability of the rubber was improved by decreasing the rubber-plasma torch distance and by increasing the duration because a partial removal of paraffin wax from the rubber surface was produced. The rubber surface was oxidized by the plasma torch treatment, and the longer the duration of the plasma torch treatment, the higher the degree of surface oxidation (mainly creation of C O moieties). However, although the rubber surface was effectively modified by the plasma torch treatment, the adhesion was not greatly improved, due to the migration of paraffin wax to the treated rubber-polyurethane adhesive interface once the adhesive joint was produced. On the other hand, the extended treatment with plasma torch facilitated the migration of zinc stearate to the rubber-adhesive interface, also contributing to deteriorate the adhesion in greater extent. Finally, it has been found that cleaning of SBS rubber in an ultrasonic bath prior to plasma torch treatment produced a partial removal of paraffin waxes from the surface, and thus improved adhesion was obtained.
NASA Astrophysics Data System (ADS)
Elfa, R. R.; Nafarizal, N.; Ahmad, M. K.; Sahdan, M. Z.; Soon, C. F.
2017-03-01
Atmospheric pressure plasma driven by Neon transformer power supply argon is presented in this paper. Atmospheric pressure plasma system has attracted researcher interest over low pressure plasma as it provides a flexibility process, cost-efficient, portable device and vacuum-free device. Besides, another golden key of this system is the wide promising application in the field of work cover from industrial and engineering to medical. However, there are still numbers of fundamental investigation that are necessary such as device configuration, gas configuration and its effect. Dielectric barrier discharge which is also known as atmospheric pressure plasma discharge is created when there is gas ionization process occur which enhance the movement of atom and electron and provide energetic particles. These energetic particles can provide modification and cleaning property to the sample surface due to the bombardment of the high reactive ion and radicals to the sample surface. In order to develop atmospheric pressure plasma discharge, a high voltage and high frequency power supply is needed. In this work, we used a neon transformer power supply as the power supply. The flow of the Ar is feed into 10 mm cylinder quartz tube with different treatment time in order to investigate the effect of the plasma discharge. The analysis of each treatment time is presented by optical emission spectroscopy (OES) and water contact angle (WCA) measurement. The increase of gas treatment time shows increases intensity of reactive Ar and reduces the angle of water droplets in water contact angle. Treatment time of 20 s microslide glass surface shows that the plasma needle discharges have modified the sample surface from hydrophilic surface to superhydrophilic surface. Thus, this leads to another interesting application in reducing sample surface adhesion to optimize productivity in the industry of paintings, semiconductor and more.
NASA Technical Reports Server (NTRS)
Hintze, Paul E.; Franco, Carolina; Hummerick, Mary E.; Maloney, Phil R.; Spencer, Lashelle E.
2017-01-01
Cold plasma (CP) cleaning is a dry, non-thermal process, which can provide broad-spectrum antimicrobial activity yet reportedly causes little to no damage to the object being sanitized. Since cold plasma uses no liquids, it has the distinct advantage when used in microgravity of not having to separate liquids from the item being cleaned. This paper will present results on an effort to use low pressure CP to disinfect or sterilize materials for in space applications. Exposure times from 0 to 60 minutes and pressures ranging from 0.10 to 1.0 mbar were used to optimize plasma parameters. Tests were done on produce and metal coupons to simulate medical equipment. Escherichia coli was used as the challenge organism on produce and Bacillus pumilus SAFR-32 was used on metal surfaces. Produce testing was not successful, with unacceptable kill rates and the produce being negatively impacted by exposure to the plasma. The plasma caused a 5 log reduction in the number of viable bacteria on metal coupon tests, which placed the number of viable bacteria below the detection limit. This is a very promising result showing that sterilization of medical equipment with cold plasma is feasible. Scanning Electron Microscope images were taken before and after exposure. The images after plasma exposure show that the bacteria spores have been physically affected, as their size has gotten smaller and their appearance has changed.
Control of surface defects on plasma-MIG hybrid welds in cryogenic aluminum alloys
NASA Astrophysics Data System (ADS)
Lee, Hee-Keun; Chun, Kwang-San; Park, Sang-Hyeon; Kang, Chung-Yun
2015-07-01
Lately, high production rate welding processes for Al alloys, which are used as LNG FPSO cargo containment system material, have been developed to overcome the limit of installation and high rework rates. In particular, plasma-metal inert gas (MIG) hybrid (PMH) welding can be used to obtain a higher deposition rate and lower porosity, while facilitating a cleaning effect by preheating and post heating the wire and the base metal. However, an asymmetric undercut and a black-colored deposit are created on the surface of PMH weld in Al alloys. For controlling the surface defect formation, the wire feeding speed and nozzle diameter in the PMH weld was investigated through arc phenomena with high-speed imaging and metallurgical analysis.
Collective phenomena in volume and surface barrier discharges
NASA Astrophysics Data System (ADS)
Kogelschatz, U.
2010-11-01
Barrier discharges are increasingly used as a cost-effective configuration to produce non-equilibrium plasmas at atmospheric pressure. This way, copious amounts of electrons, ions, free radicals and excited species can be generated without significant heating of the background gas. In most applications the barrier is made of dielectric material. Major applications utilizing mainly dielectric barriers include ozone generation, surface cleaning and modification, polymer and textile treatment, sterilization, pollution control, CO2 lasers, excimer lamps, plasma display panels (flat TV screens). More recent research efforts are devoted to biomedical applications and to plasma actuators for flow control. Sinusoidal feeding voltages at various frequencies as well as pulsed excitation schemes are used. Volume as well as surface barrier discharges can exist in the form of filamentary, regularly patterned or diffuse, laterally homogeneous discharges. The physical effects leading to collective phenomena in volume and surface barrier discharges are discussed in detail. Special attention is paid to self-organization of current filaments and pattern formation. Major similarities of the two types of barrier discharges are elaborated.
Plasma cleaning of ITER first mirrors
NASA Astrophysics Data System (ADS)
Moser, L.; Marot, L.; Steiner, R.; Reichle, R.; Leipold, F.; Vorpahl, C.; Le Guern, F.; Walach, U.; Alberti, S.; Furno, I.; Yan, R.; Peng, J.; Ben Yaala, M.; Meyer, E.
2017-12-01
Nuclear fusion is an extremely attractive option for future generations to compete with the strong increase in energy consumption. Proper control of the fusion plasma is mandatory to reach the ambitious objectives set while preserving the machine’s integrity, which requests a large number of plasma diagnostic systems. Due to the large neutron flux expected in the International Thermonuclear Experimental Reactor (ITER), regular windows or fibre optics are unusable and were replaced by so-called metallic first mirrors (FMs) embedded in the neutron shielding, forming an optical labyrinth. Materials eroded from the first wall reactor through physical or chemical sputtering will migrate and will be deposited onto mirrors. Mirrors subject to net deposition will suffer from reflectivity losses due to the deposition of impurities. Cleaning systems of metallic FMs are required in more than 20 optical diagnostic systems in ITER. Plasma cleaning using radio frequency (RF) generated plasmas is currently being considered the most promising in situ cleaning technique. An update of recent results obtained with this technique will be presented. These include the demonstration of cleaning of several deposit types (beryllium, tungsten and beryllium proxy, i.e. aluminium) at 13.56 or 60 MHz as well as large scale cleaning (mirror size: 200 × 300 mm2). Tests under a strong magnetic field up to 3.5 T in laboratory and first experiments of RF plasma cleaning in EAST tokamak will also be discussed. A specific focus will be given on repetitive cleaning experiments performed on several FM material candidates.
NASA Astrophysics Data System (ADS)
Koster, N. B.; Molkenboer, F. T.; van Veldhoven, E.; Oostrom, S.
2011-04-01
We report on our findings on EUVL reticle contamination removal, inspection and repair. We show that carbon contamination can be removed without damage to the reticle by our plasma process. Also organic particles, simulated by PSL spheres, can be removed from both the surface of the absorber as well as from the bottom of the trenches. The particles shrink in size during the plasma treatment until they are vanished. The determination of the necessary cleaning time for PSL spheres was conducted on Ru coated samples and the final experiment was performed on our dummy reticle. Finally we show that the Helium Ion Microscope in combination with a Gas Injection System is capable of depositing additional lines and squares on the reticle with sufficient resolution for pattern repair.
Surface Modification by Atmospheric Pressure Plasma for Improved Bonding
NASA Astrophysics Data System (ADS)
Williams, Thomas Scott
An atmospheric pressure plasma source operating at temperatures below 150?C and fed with 1.0-3.0 volume% oxygen in helium was used to activate the surfaces of the native oxide on silicon, carbon-fiber reinforced epoxy composite, stainless steel type 410, and aluminum alloy 2024. Helium and oxygen were passed through the plasma source, whereby ionization occurred and ˜10 16 cm-3 oxygen atoms, ˜1015 cm -3 ozone molecules and ˜1016 cm-3 metastable oxygen molecules (O21Deltag) were generated. The plasma afterglow was directed onto the substrate material located 4 mm downstream. Surface properties of the plasma treated materials have been investigated using water contact angle (WCA), atomic force microscopy (AFM), infrared spectroscopy (IR), and x-ray photoelectron spectroscopy (XPS). The work presented herein establishes atmospheric-pressure plasma as a surface preparation technique that is well suited for surface activation and enhanced adhesive bond strength in a variety of materials. Atmospheric plasma activation presents an environmentally friendly alternative to wet chemical and abrasive methods of surface preparation. Attenuated total internal reflection infrared spectroscopy was used to study the aging mechanism of the native oxide on silicon. During storage at ambient conditions, the water contact angle of a clean surface increased from <5° to 40° over a period of 12 hours. When stored under a nitrogen purge, the water contact angle of a clean surface increased from <5° to 30° over a period of 40-60 hours. The change in contact angle resulted from the adsorption of nonanal onto the exposed surface hydroxyl groups. The rate of adsorption of nonanal under a nitrogen purged atmosphere ranged from 0.378+/-0.011 hr-1 to 0.182+/-0.008 hr -1 molecules/(cm2•s), decreasing as the fraction of hydrogen-bonded hydroxyl groups increased from 49% to 96% on the SiO 2 surface. The adsorption of the organic contaminant could be suppressed indefinitely by storing the silicon wafers in the presence of activated carbon or in a freezer at -22°C. The enhancement of adhesive bond strength and durability for carbon-fiber reinforced epoxy composite, stainless steel type 410, and aluminum alloy 2024 was demonstrated with the atmospheric pressure helium-oxygen plasma. All surfaces studied were converted from a hydrophobic state with a water contact angle of 65° to 80° into a hydrophilic state with a water contact angle between 20° and 40° within 5 seconds of plasma exposure. X-ray photoelectron spectroscopy confirmed that the carbon atoms on the carbon-fiber/epoxy composite were oxidized, yielding 17 atom% carboxylic acid groups, 10% ketones or aldehydes and 9% alcohols. Analysis of stainless steel and aluminum by XPS illustrate oxidation of the metal surface and an increase in the concentration of hydroxyl groups in the oxide film. Following plasma activation, the total hydroxyl species concentration on stainless steel increased from 31% to 57%, while aluminum exhibited an increase from 4% to 16% hydroxyl species. Plasma activation of the surface led to an increase in bond strength of the different surfaces by up to 150% when using Cytec FM300 and FM300-2 epoxy adhesives. Wedge crack extension tests following plasma activation revealed cohesive failure percentages of 97% for carbon-fiber/epoxy composite bonded to stainless steel, and 96% for aluminum bonded to itself. The bond strength and durability of the substrates correlated with changes in the specific surface chemistry, not the wetting angle or the morphological properties of the material. This suggests that enhanced chemical bonding at the interface was responsible for the improvement in mechanical properties following plasma activation. The surface preparation of polymers and composites using atmospheric pressure plasmas is a promising technique for replacing traditional methods of surface preparation by sanding, grit blasting or peel ply. After oxygen plasma activation and joining the materials together with epoxy, one observes 100% cohesive failure within the cured film adhesive. Depending on the material, the lap shear strength can be increased several fold over that achieved by either solvent wiping or abrasion. The trends in adhesion with plasma exposure time do not correlate well with surface wetting or roughness; instead they correlate with the fraction of the polymer surface sites that are converted into carboxylic acid groups.
Dimitrakellis, Panagiotis; Gogolides, Evangelos
2018-04-01
Hydrophobic surfaces are often used to reduce wetting of surfaces by water. In particular, superhydrophobic surfaces are highly desired for several applications due to their exceptional properties such as self-cleaning, anti-icing, anti-friction and others. Such surfaces can be prepared via numerous methods including plasma technology, a dry technique with low environmental impact. Atmospheric pressure plasma (APP) has recently attracted significant attention as lower-cost alternative to low-pressure plasmas, and as a candidate for continuous rather than batch processing. Although there are many reviews on water-repellent surfaces, and a few reviews on APP technology, there are hardly any review works on APP processing for hydrophobic and superhydrohobic surface fabrication, a topic of high importance in nanotechnology and interface science. Herein, we critically review the advances on hydrophobic and superhydrophobic surface fabrication using APP technology, trying also to give some perspectives in the field. After a short introduction to superhydrophobicity of nanostructured surfaces and to APPs we focus this review on three different aspects: (1) The atmospheric plasma reactor technology used for fabrication of (super)hydrophobic surfaces. (2) The APP process for hydrophobic surface preparation. The hydrophobic surface preparation processes are categorized methodologically as: a) activation, b) grafting, c) polymerization, d) roughening and hydrophobization. Each category includes subcategories related to different precursors used. (3) One of the most important sections of this review concerns superhydrophobic surfaces fabricated using APP. These are methodologically characterized as follows: a) single step processes where micro-nano textured topography and low surface energy coating are created at the same time, or b) multiple step processes, where these steps occur sequentially in or out of the plasma. We end the review with some perspectives in the field. We aspire to address scientists, who will get involved in the fields of (super)hydrophobicity and/or in atmospheric pressure plasma processing. Copyright © 2018 Elsevier B.V. All rights reserved.
Negative-hydrogen-ion production from a nanoporous 12CaO • 7Al2O3 electride surface
NASA Astrophysics Data System (ADS)
Sasao, Mamiko; Moussaoui, Roba; Kogut, Dmitry; Ellis, James; Cartry, Gilles; Wada, Motoi; Tsumori, Katsuyoshi; Hosono, Hideo
2018-06-01
A high production rate of negative hydrogen ions (H‑) was observed from a nanoporous 12CaO • 7Al2O3 (C12A7) electride surface immersed in hydrogen/deuterium low-pressure plasmas. The target was negatively biased at 20–130 V, and the target surface was bombarded by H3 + ions from the plasma. The production rate was compared with that from a clean molybdenum surface. Using the pseudo-exponential work-function dependence of the H‑ production rate, the total H‑ yield from the C12A7 electride surface bombarded at 80 V was evaluated to be 25% of that from a cesiated molybdenum surface with the lowest work-function. The measured H‑ energy spectrum indicates that the major production mechanism is desorption by sputtering. This material has potential to be used as a production surface of cesium-free negative ion sources for accelerators, heating beams in nuclear fusion, and surface modification for industrial applications.
Characterization of microwave discharge plasmas for surface processing
NASA Astrophysics Data System (ADS)
Nikolic, Milka
We have developed several diagnostic techniques to characterize two types of microwave (MW) discharge plasmas: a supersonic flowing argon MW discharge maintained in a cylindrical quartz cavity at frequency ƒ = 2.45 GHz and a pulse repetitive MW discharge in air at ƒ = 9.5 GHz. Low temperature MW discharges have been proven to posses attractive properties for plasma cleaning and etching of niobium surfaces of superconductive radio frequency (SRF) cavities. Plasma based surface modification technologies offer a promising alternative for etching and cleaning of SRF cavities. These technologies are low cost, environmentally friendly and easily controllable, and present a possible alternative to currently used acid based wet technologies, such as buffered chemical polishing (BCP), or electrochemical polishing (EP). In fact, weakly ionized. non-equilibrium, and low temperature gas discharges represent a powerful tool for surface processing due to the strong chemical reactivity of plasma radicals. Therefore, characterizing these discharges by applying non-perturbing, in situ measurement techniques is of vital importance. Optical emission spectroscopy has been employed to analyze the molecular structure and evaluate rotational and vibrational temperatures in these discharges. The internal plasma structure was studied by applying a tomographic numerical method based on the two-dimensional Radon formula. An automated optical measurement system has been developed for reconstruction of local plasma parameters. It was found that excited argon states are concentrated near the tube walls, thus confirming the assumption that the post discharge plasma is dominantly sustained by a travelling surface wave. Employing a laser induced fluorescence technique in combination with the time synchronization device allowed us to obtain time-resolved population densities of some excited atomic levels in argon. We have developed a technique for absolute measurements of electron density based on the time-resolved absolute intensity of a Nitrogen spectral band belonging to the Second Positive System, the kinetic model and the detailed particle balance of the N2 (C 3piu) state. Measured electron density waveforms are in fair agreement with electron densities obtained using the Stark broadening technique. In addition, time dependent population densities of Ar I metastable and resonant levels were obtained by employing a kinetic model developed based on analysis of population density rates of excited Ar I p levels. Both the experimental results and numerical models for both types of gas discharges indicate that multispecies chemistry of gases plays an important role in understanding the dynamics and characterizing the properties of these discharges.
NASA Astrophysics Data System (ADS)
Wimmer, C.; Schiesko, L.; Fantz, U.
2016-02-01
BATMAN (Bavarian Test Machine for Negative ions) is a test facility equipped with a 1/8 scale H- source for the ITER heating neutral beam injection. Several diagnostics in the boundary layer close to the plasma grid (first grid of the accelerator system) followed the transition from volume to surface dominated H- production starting with a Cs-free, cleaned source and subsequent evaporation of caesium, while the source has been operated at ITER relevant pressure of 0.3 Pa: Langmuir probes are used to determine the plasma potential, optical emission spectroscopy is used to follow the caesiation process, and cavity ring-down spectroscopy allows for the measurement of the H- density. The influence on the plasma during the transition from an electron-ion plasma towards an ion-ion plasma, in which negative hydrogen ions become the dominant negatively charged particle species, is seen in a strong increase of the H- density combined with a reduction of the plasma potential. A clear correlation of the extracted current densities (jH-, je) exists with the Cs emission.
Wimmer, C; Schiesko, L; Fantz, U
2016-02-01
BATMAN (Bavarian Test Machine for Negative ions) is a test facility equipped with a 18 scale H(-) source for the ITER heating neutral beam injection. Several diagnostics in the boundary layer close to the plasma grid (first grid of the accelerator system) followed the transition from volume to surface dominated H(-) production starting with a Cs-free, cleaned source and subsequent evaporation of caesium, while the source has been operated at ITER relevant pressure of 0.3 Pa: Langmuir probes are used to determine the plasma potential, optical emission spectroscopy is used to follow the caesiation process, and cavity ring-down spectroscopy allows for the measurement of the H(-) density. The influence on the plasma during the transition from an electron-ion plasma towards an ion-ion plasma, in which negative hydrogen ions become the dominant negatively charged particle species, is seen in a strong increase of the H(-) density combined with a reduction of the plasma potential. A clear correlation of the extracted current densities (j(H(-)), j(e)) exists with the Cs emission.
Experiments and PIC simulations on liquid crystal plasma mirrors for pulse contrast enhancement
NASA Astrophysics Data System (ADS)
Cochran, G. E.; Poole, P. L.; Krygier, A.; Foster, P. S.; Scott, G. G.; Wilson, L. A.; Bailey, J.; Bourgeois, N.; Hernandez-Gomez, C.; Heery, R.; Purcell, J.; Neely, D.; Rajeev, P. P.; Freeman, R. R.; Schumacher, D. W.
2016-10-01
High pulse contrast is crucial for performing many experiments on high intensity lasers in order to minimize modification of the target surface by pre-pulse. This is often achieved through the use of solid dielectric plasma mirrors which can limit laser shot rates. Liquid crystal films, originally developed as variable thickness ion acceleration targets, have been demonstrated as effective plasma mirrors for pulse cleaning, reaching peak reflectivities over 70%. These films were used as plasma mirrors in an ion acceleration experiment on the Scarlet laser and the resultant increase in peak proton energy and change in acceleration direction will be discussed. Also presented here are novel 2D3V, LSP particle-in-cell simulations of dielectric plasma mirror operation. By including multiphoton ionization and dimensionality corrections, an excellent match to experiment is obtained over 4 decades in intensity. Analysis of pulse shortening and plasma critical surface behavior in these simulations will be discussed. Formation of thin films at 1.5 Hz will also be presented. Performed with support from the DARPA PULSE program through AMRDEC, from NNSA, and from OSC.
Harris, Candace D.; Shen, Nan; Rubenchik, Alexander M.; ...
2015-11-04
Here, time-resolved plasma emission spectroscopy was used to characterize the energy coupling and temperature rise associated with single, 10-ns pulsed laser ablation of metallic particles bound to transparent substrates. Plasma associated with Fe(I) emission lines originating from steel microspheres was observed to cool from >24,000 to ~15,000 K over ~220 ns asmore » $$\\tau$$ -0.28, consistent with radiative losses and adiabatic gas expansion of a relatively free plasma. Simultaneous emission lines from Si(II) associated with the plasma etching of the SiO2 substrate were observed yielding higher plasma temperatures, ~35,000 K, relative to the Fe(I) plasma. Lastly, the difference in species temperatures is consistent with plasma confinement at the microsphere-substrate interface as the particle is ejected, and is directly visualized using pump-probe shadowgraphy as a function of pulsed laser energy.« less
Saksø, Mikkel; Jakobsen, Stig S; Saksø, Henrik; Baas, Jørgen; Jakobsen, Thomas; Søballe, Kjeld
2012-01-01
Interaction between implant surface and surrounding bone influences implant fixation. We attempted to improve the bone-implant interaction by 1) adding surface micro scale topography by acid etching, and 2) removing surface-adherent pro-inflammatory agents by plasma cleaning. Implant fixation was evaluated by implant osseointegration and biomechanical fixation. The study consisted of two paired animal sub-studies where 10 skeletally mature Labrador dogs were used. Grit blasted titanium alloy implants were inserted press fit in each proximal tibia. In the first study grit blasted implants were compared with acid etched grit blasted implants. In the second study grit blasted implants were compared with acid etched grit blasted implants that were further treated with plasma sterilization. Implant performance was evaluated by histomorphometrical investigation (tissue-to-implant contact, peri-implant tissue density) and mechanical push-out testing after four weeks observation time. Neither acid etching nor plasma sterilization of the grit blasted implants enhanced osseointegration or mechanical fixation in this press-fit canine implant model in a statistically significant manner. PMID:22962567
DOE Office of Scientific and Technical Information (OSTI.GOV)
Pankow, J. W.; Glick, S. H.
2006-05-01
Flexible polymer substrates coated with inorganic oxide moisture barriers are a potential replacement for glass backsheets in thin-film PV (photovoltaic) modules. Silicon oxynitride (SiO{sub x}N{sub y}) deposited by plasma enhanced chemical vapor deposition (PECVD) on polyethylene terephthalate (PET) represents one potential new backsheet candidate. Barrier deposition runs at NREL have included a nitrogen-rich plasma pretreatment prior to barrier deposition with the intention of cleaning the PET surface and enhancing adhesion of the SiO{sub x}N{sub y} barrier film to PET; however, test coupons of PET/barrier/EVA/TPE failed after damp-heat exposure. (EVA is ethylene vinyl acetate and TPE is Tedlar{reg_sign}-PET-EVA). PET substrates exposedmore » to plasma conditions similar to those used in pretreatment were examined by X-ray photoelectron spectroscopy (XPS) to reveal that new low molecular weight PET fragments were created at the PET surface. These fragments are responsible for barrier/PET interfacial failure and barrier transfer to the EVA encapsulant side following damp heat exposure.« less
Method and apparatus for monitoring plasma processing operations
Smith, Jr., Michael Lane; Ward, Pamela Denise Peardon; Stevenson, Joel O'Don
2002-01-01
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). Another aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system. A final aspect of the present invention relates to a network a plurality of plasma monitoring systems, including with remote capabilities (i.e., outside of the clean room).
Material Surface Characteristics and Plasma Performance in the Lithium Tokamak Experiment
NASA Astrophysics Data System (ADS)
Lucia, Matthew James
The performance of a tokamak plasma and the characteristics of the surrounding plasma facing component (PFC) material surfaces strongly influence each other. Despite this relationship, tokamak plasma physics has historically been studied more thoroughly than PFC surface physics. The disparity is particularly evident in lithium PFC research: decades of experiments have examined the effect of lithium PFCs on plasma performance, but the understanding of the lithium surface itself is much less complete. This latter information is critical to identifying the mechanisms by which lithium PFCs affect plasma performance. This research focused on such plasma-surface interactions in the Lithium Tokamak Experiment (LTX), a spherical torus designed to accommodate solid or liquid lithium as the primary PFC. Surface analysis was accomplished via the novel Materials Analysis and Particle Probe (MAPP) diagnostic system. In a series of experiments on LTX, the MAPP x-ray photoelectron spectroscopy (XPS) and thermal desorption spectroscopy (TDS) capabilities were used for in vacuo interrogation of PFC samples. This represented the first application of XPS and TDS for in situ surface analysis of tokamak PFCs. Surface analysis indicated that the thin (dLi ˜ 100nm) evaporative lithium PFC coatings in LTX were converted to Li2O due to oxidizing agents in both the residual vacuum and the PFC substrate. Conversion was rapid and nearly independent of PFC temperature, forming a majority Li2O surface within minutes and an entirely Li2O surface within hours. However, Li2O PFCs were still capable of retaining hydrogen and sequestering impurities until the Li2 O was further oxidized to LiOH, a process that took weeks. For hydrogen retention, Li2O PFCs retained H+ from LTX plasma discharges, but no LiH formation was observed. Instead, results implied that H+ was only weakly-bound, such that it almost completely outgassed as H 2 within minutes. For impurity sequestration, LTX plasma performance---ascertained from plasma current and density measurements---progressively improved as plasma carbon and oxygen impurity levels fell. This was true for PFC conditioning by vacuum baking and argon glow discharge cleaning, as well as by lithium evaporation. Some evidence suggested that impurity sequestration was more important than hydrogen retention in enhancing LTX plasma performance. In contrast with expectations for lithium PFCs, heating the Li2 O PFCs in LTX caused increased plasma impurity levels that tended to reduce plasma performance.
NASA Astrophysics Data System (ADS)
Yang, Hongsheng; Kim, Junghwan; Yamamoto, Koji; Xing, Xing; Hosono, Hideo
2018-03-01
We report a unique amorphous oxide semiconductor Znsbnd Sisbnd O (a-ZSO) which has a small work function of 3.4 eV for as-deposited films. The surface modification of a-ZSO thin films by plasma treatments is examined to apply it to the electron injection/transport layer of organic devices. It turns out that the energy alignment and exciton dissociation efficiency at a-ZSO/organic semiconductor interface significantly changes by choosing different gas (oxygen or argon) for plasma treatments (after a-ZSO was exposed to atmospheric environment for 5 days). In situ ultraviolet photoelectron spectroscopy (UPS) measurement reveals that the work function of a-ZSO is increased to 4.0 eV after an O2-plasma treatment, while the work function of 3.5 eV is recovered after an Ar-plasma treatment which indicates this treatment is effective for surface cleaning. To study the effects of surface treatments to device performance, OLEDs and hybrid polymer solar cells with O2-plasma or Ar-plasma treated a-ZSO are compared. Effects of these surface treatments on performance of inverted OLEDs and hybrid polymer solar cells are examined. Ar-plasma treated a-ZSO works well as the electron injection layer in inverted OLEDs (Alq3/a-ZSO) because the injection barrier is small (∼ 0.1 eV). On the other hands, O2-plasma treated a-ZSO is more suitable for application to hybrid solar cells which is benefiting from higher exciton dissociation efficiency at polymer (P3HT)/ZSO interface.
40 CFR 98.90 - Definition of the source category.
Code of Federal Regulations, 2012 CFR
2012-07-01
... uses plasma-generated fluorine atoms and other reactive fluorine-containing fragments, that chemically... thin films are cleaned periodically using plasma-generated fluorine atoms and other reactive fluorine-containing fragments. (3) Any electronics production process in which wafers are cleaned using plasma...
40 CFR 98.90 - Definition of the source category.
Code of Federal Regulations, 2011 CFR
2011-07-01
... uses plasma-generated fluorine atoms and other reactive fluorine-containing fragments, that chemically... thin films are cleaned periodically using plasma-generated fluorine atoms and other reactive fluorine-containing fragments. (3) Any electronics production process in which wafers are cleaned using plasma...
40 CFR 98.90 - Definition of the source category.
Code of Federal Regulations, 2013 CFR
2013-07-01
... uses plasma-generated fluorine atoms and other reactive fluorine-containing fragments, that chemically... thin films are cleaned periodically using plasma-generated fluorine atoms and other reactive fluorine-containing fragments. (3) Any electronics production process in which wafers are cleaned using plasma...
40 CFR 98.90 - Definition of the source category.
Code of Federal Regulations, 2014 CFR
2014-07-01
... uses plasma-generated fluorine atoms and other reactive fluorine-containing fragments, that chemically... thin films are cleaned periodically using plasma-generated fluorine atoms and other reactive fluorine-containing fragments. (3) Any electronics production process in which wafers are cleaned using plasma...
Porcelain-coated antenna for radio-frequency driven plasma source
Leung, Ka-Ngo; Wells, Russell P.; Craven, Glen E.
1996-01-01
A new porcelain-enamel coated antenna creates a clean plasma for volume or surface-conversion ion sources. The porcelain-enamel coating is hard, electrically insulating, long lasting, non fragile, and resistant to puncture by high energy ions in the plasma. Plasma and ion production using the porcelain enamel coated antenna is uncontaminated with filament or extraneous metal ion because the porcelain does not evaporate and is not sputtered into the plasma during operation. Ion beams produced using the new porcelain-enamel coated antenna are useful in ion implantation, high energy accelerators, negative, positive, or neutral beam applications, fusion, and treatment of chemical or radioactive waste for disposal. For ion implantation, the appropriate species ion beam generated with the inventive antenna will penetrate large or small, irregularly shaped conducting objects with a narrow implantation profile.
Size and shape dependence of CO adsorption sites on sapphire supported Fe microcrystals
NASA Technical Reports Server (NTRS)
Papageorgopoulos, C.; Heinemann, K.
1985-01-01
The surface structure and stoichiometry of alumina substrates, as well as the size, growth characteristics, and shape of Fe deposits on sapphire substrates have been investigated by low energy electron diffraction (LEED), Auger electron spectroscopy, electron energy loss spectroscopy, and X-ray photoemission spectroscopy (XPS), as well as work function measurements, in conjunction with transition electron microscopy observations. The substrates used in this work were the following: (1) new, clean Al2O3; (2) same surface amorphized by Ar ion bombardment; (3) same surface regenerated by 650 C annealing; (4) amorphous alumina films on Ta slab; and (5) polycrystal alumina films, obtained by heating amorphous films to 600 C. Substrate cleaning was found to be most effective in producing a reproducible surface upon oxygen RF plasma treatment. The Fe nucleation and growth process was found to depend strongly on the type of substrate surface and deposition conditions. Ar ion bombardment under beam flooding, and subsequent annealing at 650 C was found an effective means to restore the original Al2O3 (1102) surface for renewed Fe deposition.
Frazer, L
1999-01-01
Thanks to a series of joint research projects by Los Alamos National Laboratory, Beta Squared of Allen, Texas, and the University of California at Los Angeles, there is now a more environmentally sound method for cleaning semiconductor chips that may also be effective in cleaning up chemical, bacterial, and nuclear contaminants. The Atmospheric Pressure Plasma Jet uses a type of ionized gas called plasma to clean up contaminants by binding to them and lifting them away. In contrast to the corrosive acids and chemical solvents traditionally used to clean semiconductor chips, the jet oxidizes contaminants, producing only benign gaseous by-products such as oxygen and carbon dioxide. The new technology is also easy to transport, cleans thoroughly and quickly, and presents no hazards to its operators. PMID:10417375
SPARCLE: Space Plasma Alleviation of Regolith Concentrations in the Lunar Environment
NASA Astrophysics Data System (ADS)
Clark, P. E.; Keller, J. W.; Curtis, S. A.; Nuth, J. A.; Stubbs, T. J.; Farrell, W. M.
2006-05-01
The return of robotic devices and humans to the Moon will occur in the near future. Based on our previous experience, surface dust is a major problem requiring a solution: During Apollo landings, extensive locally- induced stirring of the regolith caused dust to be suspended long enough to come into contact with conducting surfaces. Dust behaved like abrasive Velcro: it adhered to everything and attempts to remove it by simply brushing did not remove fines (<10) and resulted in severe abrasion. Lunar fines, because of their electrostatic charging, were relatively difficult to collect in sample bags along with other size range particles. Within hours, seals were broken, samples contaminated, and portions of the samples, especially fines, lost. Because of this difficulty, details on lunar dust are relatively sparse. Obviously, the strategies initially implemented to deal with lunar dust failed. A major technological challenge will be developing a dust mitigation strategy. A currently proposed strategy based increased magnetic susceptibility in lunar fines may not work uniformly well for fines of non-mare, or non-lunar, composition. Based on dust behavior already observed on previous missions, we believe the successful strategy will deal with dust dynamics resulting from interaction between mechanical and electrostatic forces. We are planning test and develop an electrostatically-based device to modulate the electrical potential of conducting surfaces, hence to self clean exposed surfaces while collecting dust samples. It would scan a surface constantly to control its potential, and a plate of the opposite potential. As a first step, an experimental low mass, power, and volume device with complimentary electron and ion guns with specially designed self-cleaning nozzles are being designed for to test our concept and develop a working charging and discharging strategy in the lunar environment. Meanwhile, a laboratory simulation will act as a feasibility study for a laboratory breadboard self-cleaning device based on the use of combined electron or ion beams. The compact device would act as plasma dust sweeper.
In situ dc oxygen‐discharge cleaning system for optical elements
DOE Office of Scientific and Technical Information (OSTI.GOV)
Koide, Tsuneharu; Shidara, Tetsuo; Tanaka, Kenichiro
1989-07-15
In situ dc oxygen‐discharge cleaning arrangements have been developed at the Photon Factory for the removal of carbon contamination from optical surfaces. A high cleaning rate could be achieved by producing an oxygen plasma close to the optical elements with special care taken to avoid any harmful effects from the discharge; contaminant carbon was completely removed within a few hours, at most. This short exposure time and the use of dry oxygen gas resulted in a restoration of the original ultrahigh vacuum without a bakeout. Results with a Seya‐Namioka beamline for gas‐phase experiments showed a flux enhancement amounting to amore » factor of 50, and results with a grasshopper beamline showed a nearly complete recovery of the light intensity, even at the carbon K edge.« less
Photoresist removal using gaseous sulfur trioxide cleaning technology
NASA Astrophysics Data System (ADS)
Del Puppo, Helene; Bocian, Paul B.; Waleh, Ahmad
1999-06-01
A novel cleaning method for removing photoresists and organic polymers from semiconductor wafers is described. This non-plasma method uses anhydrous sulfur trioxide gas in a two-step process, during which, the substrate is first exposed to SO3 vapor at relatively low temperatures and then is rinsed with de-ionized water. The process is radically different from conventional plasma-ashing methods in that the photoresist is not etched or removed during the exposure to SO3. Rather, the removal of the modified photoresist takes place during the subsequent DI-water rinse step. The SO3 process completely removes photoresist and polymer residues in many post-etch applications. Additional advantages of the process are absence of halogen gases and elimination of the need for other solvents and wet chemicals. The process also enjoys a very low cost of ownership and has minimal environmental impact. The SEM and SIMS surface analysis results are presented to show the effectiveness of gaseous SO3 process after polysilicon, metal an oxide etch applications. The effects of both chlorine- and fluorine-based plasma chemistries on resist removal are described.
Plasma needle: treatment of living cells and tissues
NASA Astrophysics Data System (ADS)
Stoffels, Eva
2003-10-01
Non-thermal plasmas are capable of refined treatment of heat sensitive surfaces. Recently, many non-thermal sources working under atmospheric pressure have been constructed. Their main applications are various surface treatments: cleaning, etching, changing the wettability/adhesion, and bacterial decontamination. A new research at the Eindhoven University of Technology focuses on in vivo treatment by means of a novel non-thermal plasma source (the plasma needle). At present, a fundamental study has been undertaken to identify all possible responses of living objects exposed to the plasma. Plasma treatment does not lead to cell death (necrosis), which is a cause of inflammation. On the contrary, we observe various sophisticated reactions of mammalian cells, e.g. cell detachment (loss of cell contact) and programmed cell death (apoptosis). Moreover, under certain conditions the plasma is capable of killing bacteria, while eukaryotic cells remain unharmed. These findings may result in development of new techniques, like bacterial sterilization of infected (living) tissues or removal of cells without inflammatory response, and on a longer time scale to new methods in the health care. Possible applications include treatment of skin ailments, aiding wound healing and sterilization of dental cavities.
Tribological properties of boron nitride synthesized by ion beam deposition
NASA Technical Reports Server (NTRS)
Miyoshi, K.; Buckley, D. H.; Spalvins, T.
1985-01-01
The adhesion and friction behavior of boron nitride films on 440 C bearing stainless steel substrates was examined. The thin films containing the boron nitride were synthesized using an ion beam extracted from a borazine plasma. Sliding friction experiments were conducted with BN in sliding contact with itself and various transition metals. It is indicated that the surfaces of atomically cleaned BN coating film contain a small amount of oxides and carbides, in addition to boron nitride. The coefficients of friction for the BN in contact with metals are related to the relative chemical activity of the metals. The more active the metal, the higher is the coefficient of friction. The adsorption of oxygen on clean metal and BN increases the shear strength of the metal - BN contact and increases the friction. The friction for BN-BN contact is a function of the shear strength of the elastic contacts. Clean BN surfaces exhibit relatively strong interfacial adhesion and high friction. The presence of adsorbates such as adventitious carbon contaminants on the BN surfaces reduces the shear strength of the contact area. In contrast, chemically adsorbed oxygen enhances the shear strength of the BN-BN contact and increases the friction.
Hydrophobic Surface Modification of Silk Fabric Using Plasma-Polymerized Hmdso
NASA Astrophysics Data System (ADS)
Rani, K. Vinisha; Chandwani, Nisha; Kikani, Purvi; Nema, S. K.; Sarma, Arun Kumar; Sarma, Bornali
In this work, we study the hydrophobic properties of silk fabrics by deposition of plasma-polymerized (pp) hexamethyldisiloxane (HMDSO) using low-pressure plasma-enhanced chemical vapor deposition. Recently, hydrophobic properties are under active research in textile industry. The effects of coating time and power on the HMDSO-coated silk fabrics are investigated. Water contact angle of pp-HMDSO-coated silk fabric surface is measured as a function of power and coating time. Fabric surface shows an enhancement in hydrophobicity after coating. Attenuated total reflectance-Fourier transform infrared spectroscopy reveals the surface chemistry, and scanning electron microscopy shows the surface morphology of the uncoated and HMDSO-coated fabrics, respectively. In the case of uncoated fabric, water droplet absorbs swiftly, whereas in the case of HMDSO-coated fabric, water droplet remains on the fabric surface with a maximum contact angle of 140∘. The HMDSO-deposited silk surface is found to be durable after detergent washing. Common stains such as ink, tea, milk, turmeric and orange juice are tested on the surface of both fabrics. In HMDSO-coated fabrics, all the stains are bedded like ball droplet. In order to study the self-cleaning property, the fabric is tilted to 45∘ angle; stain droplets easily roll off from the fabric.
Toma, Mana; Loget, Gabriel; Corn, Robert M
2014-07-23
Tunable hydrophobic/hydrophilic flexible Teflon nanocone array surfaces were fabricated over large areas (cm(2)) by a simple two-step method involving the oxygen plasma etching of a colloidal monolayer of polystyrene beads on a Teflon film. The wettability of the nanocone array surfaces was controlled by the nanocone array dimensions and various additional surface modifications. The resultant Teflon nanocone array surfaces were hydrophobic and adhesive (a "gecko" type of surface on which a water droplet has a high contact angle but stays in place) with a contact angle that correlated with the aspect ratio/sharpness of the nanocones. The surfaces switched to a superhydrophobic or "lotus" type of surface when hierarchical nanostructures were created on Teflon nanocones by modifying them with a gold nanoparticle (AuNPs) film. The nanocone array surfaces could be made superhydrophobic with a maximum contact angle of 160° by the further modification of the AuNPs with an octadecanethiol (C18SH) monolayer. Additionally, these nanocone array surfaces became hydrophilic when the nanocone surfaces were sequentially modified with AuNPs and hydrophilic polydopamine (PDA) layers. The nanocone array surfaces were tested for two potential applications: self-cleaning superhydrophobic surfaces and for the passive dispensing of aqueous droplets onto hybrid superhydrophobic/hydrophilic microarrays.
Porcelain-coated antenna for radio-frequency driven plasma source
Leung, K.N.; Wells, R.P.; Craven, G.E.
1996-12-24
A new porcelain-enamel coated antenna creates a clean plasma for volume or surface-conversion ion sources. The porcelain-enamel coating is hard, electrically insulating, long lasting, non fragile, and resistant to puncture by high energy ions in the plasma. Plasma and ion production using the porcelain enamel coated antenna is uncontaminated with filament or extraneous metal ions because the porcelain does not evaporate and is not sputtered into the plasma during operation. Ion beams produced using the new porcelain-enamel coated antenna are useful in ion implantation, high energy accelerators, negative, positive, or neutral beam applications, fusion, and treatment of chemical or radioactive waste for disposal. For ion implantation, the appropriate species ion beam generated with the inventive antenna will penetrate large or small, irregularly shaped conducting objects with a narrow implantation profile. 8 figs.
Surface fluorination of zirconia: adhesive bond strength comparison to commercial primers.
Piascik, Jeffrey R; Swift, Edward J; Braswell, Krista; Stoner, Brian R
2012-06-01
This study evaluated contact angle and shear bond strength of three commercial zirconia primers and compared them to a recently developed fluorination pre-treatment. Earlier investigations reported that plasma fluorinated zirconia modifies the chemical bonding structure creating a more reactive surface. Yttria-stabilized zirconia (LAVA, 3M ESPE) plates were highly polished using 3μm diamond paste (R(a) ∼200nm) prior to pretreatments. After primer and fluorination treatment, contact angles were measured to quantify surface hydrophobicity before and after ethanol clean. Additionally, simple shear bond tests were performed to measure the adhesion strength to a composite resin. Plasma fluorination produced the lowest contact angle (7.8°) and the highest shear bond strength (37.3MPa) suggesting this pretreatment facilitates a more "chemically" active surface for adhesive bonding. It is hypothesized that plasma fluorination increase hydroxylation at the surface, making it more reactive, thus allowing for covalent bonding between zirconia surface and resin cement. A strong correlation was observed between contact angle and adhesion strength for all specimens; a relationship which may help understand the frequency and modes of failures, clinically. It is also believed that this surface treatment can increase long-term viability of zirconia restorations over other adhesive techniques. Copyright © 2012 Academy of Dental Materials. Published by Elsevier Ltd. All rights reserved.
Damar Huner, Irem; Gulec, Haci Ali
2017-12-01
The aim of the study was to investigate the effects of hydrophilic surface modification via atmospheric pressure jet plasma (ApJPls) on the fouling propensity of polyethersulfone (PES) ultrafiltration (UF) membranes during concentration of whey proteins. The distance from nozzle to substrate surface of 30mm and the exposure period of 5 times were determined as the most effective parameters enabling an increase in ΔG iwi value of the plain membrane from (-) 14.92±0.89mJ/m 2 to (+) 17.57±0.67mJ/m 2 . Maximum hydrophilicity and minimum surface roughness achieved by argon plasma action resulted in better antifouling behavior, while the hydraulic permeability and the initial permeate flux were decreased sharply due to the plasma-induced surface cross-linking. A quite steady state flux was obtained throughout the UF with the ApJPls modified PES membrane. The contribution of R frev to R t , which was 94% for the UF through the plain membrane, decreased to 43% after the plasma treatment. The overall results of this study highlighted the ApJPls modification decreased the fouling propensity of PES membrane without affecting the original protein rejection capability and improved the recovery of initial permeate flux after chemical cleaning. Copyright © 2017 Elsevier B.V. All rights reserved.
Method for Cleaning Laser-Drilled Holes on Printed Wiring Boards by Plasma Treatment
NASA Astrophysics Data System (ADS)
Hirogaki, Toshiki; Aoyama, Eiichi; Minagi, Ryu; Ogawa, Keiji; Katayama, Tsutao; Matsuoka, Takashi; Inoue, Hisahiro
We propose a new method for cleaning blind via holes after laser drilling of PWBs using oxygen plasma treatment. This report dealt with three kinds of PWB materials: epoxy resin and two kinds of aramid fiber reinforced plastics (AFRP: Technora or Kevlar fiber reinforcement). We observed the drilled holes after plasma treatment using both an optical and a scanning electric microscope (SEM). It was confirmed that adequate etching took place in the drilled holes by plasma treatment. We also compared the hole wall and hole bottom after plasma treatment with ones after chemical etching. It was clear that there was no damage to the aramid fiber tip on the hole wall, and that a smooth roughness of the hole wall was obtained by means of plasma treatment. As a result, we demonstrated that the plasma treatment is effective in cleaning the laser drilled holes of PWBs.
The Role of Surface Chemistry in Adhesion and Wetting of Gecko Toe Pads
Badge, Ila; Stark, Alyssa Y.; Paoloni, Eva L.; Niewiarowski, Peter H.; Dhinojwala, Ali
2014-01-01
An array of micron-sized setal hairs offers geckos a unique ability to walk on vertical surfaces using van der Waals interactions. Although many studies have focused on the role of surface morphology of the hairs, very little is known about the role of surface chemistry on wetting and adhesion. We expect that both surface chemistry and morphology are important, not only to achieve optimum dry adhesion but also for increased efficiency in self-cleaning of water and adhesion under wet conditions. Here, we used a plasma-based vapor deposition process to coat the hairy patterns on gecko toe pad sheds with polar and non-polar coatings without significantly perturbing the setal morphology. By a comparison of wetting across treatments, we show that the intrinsic surface of gecko setae has a water contact angle between 70–90°. As expected, under wet conditions, adhesion on a hydrophilic surface (glass) was lower than that on a hydrophobic surface (alkyl-silane monolayer on glass). Surprisingly under wet and dry conditions the adhesion was comparable on the hydrophobic surface, independent of the surface chemistry of the setal hairs. This work highlights the need to utilize morphology and surface chemistry in developing successful synthetic adhesives with desirable adhesion and self-cleaning properties. PMID:25323067
The Role of Surface Chemistry in Adhesion and Wetting of Gecko Toe Pads
NASA Astrophysics Data System (ADS)
Badge, Ila; Stark, Alyssa Y.; Paoloni, Eva L.; Niewiarowski, Peter H.; Dhinojwala, Ali
2014-10-01
An array of micron-sized setal hairs offers geckos a unique ability to walk on vertical surfaces using van der Waals interactions. Although many studies have focused on the role of surface morphology of the hairs, very little is known about the role of surface chemistry on wetting and adhesion. We expect that both surface chemistry and morphology are important, not only to achieve optimum dry adhesion but also for increased efficiency in self-cleaning of water and adhesion under wet conditions. Here, we used a plasma-based vapor deposition process to coat the hairy patterns on gecko toe pad sheds with polar and non-polar coatings without significantly perturbing the setal morphology. By a comparison of wetting across treatments, we show that the intrinsic surface of gecko setae has a water contact angle between 70-90°. As expected, under wet conditions, adhesion on a hydrophilic surface (glass) was lower than that on a hydrophobic surface (alkyl-silane monolayer on glass). Surprisingly under wet and dry conditions the adhesion was comparable on the hydrophobic surface, independent of the surface chemistry of the setal hairs. This work highlights the need to utilize morphology and surface chemistry in developing successful synthetic adhesives with desirable adhesion and self-cleaning properties.
Material Surface Characteristics and Plasma Performance in the Lithium Tokamak Experiment
DOE Office of Scientific and Technical Information (OSTI.GOV)
Lucia, Matthew James
The performance of a tokamak plasma and the characteristics of the surrounding plasma facing component (PFC) material surfaces strongly influence each other. Despite this relationship, tokamak plasma physics has historically been studied more thoroughly than PFC surface physics. The disparity is particularly evident in lithium PFC research: decades of experiments have examined the effect of lithium PFCs on plasma performance, but the understanding of the lithium surface itself is much less complete. This latter information is critical to identifying the mechanisms by which lithium PFCs affect plasma performance. This research focused on such plasma-surface interactions in the Lithium Tokamak Experimentmore » (LTX), a spherical torus designed to accommodate solid or liquid lithium as the primary PFC. Surface analysis was accomplished via the novel Materials Analysis and Particle Probe (MAPP) diagnostic system. In a series of experiments on LTX, the MAPP x-ray photoelectron spectroscopy (XPS) and thermal desorption spectroscopy (TDS) capabilities were used for in vacuo interrogation of PFC samples. This represented the first application of XPS and TDS for in situ surface analysis of tokamak PFCs. Surface analysis indicated that the thin (d ~ 100nm) evaporative lithium PFC coatings in LTX were converted to Li2O due to oxidizing agents in both the residual vacuum and the PFC substrate. Conversion was rapid and nearly independent of PFC temperature, forming a majority Li2O surface within minutes and an entirely Li2O surface within hours. However, Li2O PFCs were still capable of retaining hydrogen and sequestering impurities until the Li2O was further oxidized to LiOH, a process that took weeks. For hydrogen retention, Li2O PFCs retained H+ from LTX plasma discharges, but no LiH formation was observed. Instead, results implied that H+ was only weakly-bound, such that it almost completely outgassed as H2 within minutes. For impurity sequestration, LTX plasma performance—ascertained from plasma current and density measurements—progressively improved as plasma carbon and oxygen impurity levels fell. This was true for PFC conditioning by vacuum baking and argon glow discharge cleaning, as well as by lithium evaporation. Some evidence suggested that impurity sequestration was more important than hydrogen retention in enhancing LTX plasma performance. In contrast with expectations for lithium PFCs, heating the Li2O PFCs in LTX caused increased plasma impurity levels that tended to reduce plasma performance.« less
DOE Office of Scientific and Technical Information (OSTI.GOV)
Kuznetsov, A. P., E-mail: APKuznetsov@mephi.ru; Buzinskij, O. I.; Gubsky, K. L.
A set of optical diagnostics is expected for measuring the plasma characteristics in ITER. Optical elements located inside discharge chambers are exposed to an intense radiation load, sputtering due to collisions with energetic atoms formed in the charge transfer processes, and contamination due to recondensation of materials sputtered from different parts of the construction of the chamber. Removing the films of the sputtered materials from the mirrors with the aid of pulsed laser radiation is an efficient cleaning method enabling recovery of the optical properties of the mirrors. In this work, we studied the efficiency of removal of metal oxidemore » films by pulsed radiation of a fiber laser. Optimization of the laser cleaning conditions was carried out on samples representing metal substrates polished with optical quality with deposition of films on them imitating the chemical composition and conditions expected in ITER. It is shown that, by a proper selection of modes of radiation exposure to the surface with a deposited film, it is feasible to restore the original high reflection characteristics of optical elements.« less
/ital In/ /ital situ/ dc oxygen-discharge cleaning system for optical elements
DOE Office of Scientific and Technical Information (OSTI.GOV)
Koide, T.; Shidara, T.; Tanaka, K.
1989-07-01
/ital In/ /ital situ/ dc oxygen-discharge cleaning arrangements have been developed at the Photon Factory for the removal of carbon contamination from optical surfaces. A high cleaning rate could be achieved by producing an oxygen plasma close to the optical elements with special care taken to avoid any harmful effects from the discharge; contaminant carbon was completely removed within a few hours, at most. This short exposure time and the use of dry oxygen gas resulted in a restoration of the original ultrahigh vacuum without a bakeout. Results with a Seya-Namioka beamline for gas-phase experiments showed a flux enhancement amountingmore » to a factor of 50, and results with a grasshopper beamline showed a nearly complete recovery of the light intensity, even at the carbon /ital K/ edge.« less
Etude Spectroscopique des Surfaces des Couches Minces de Silicium Amorphe Hydrogene
NASA Astrophysics Data System (ADS)
Bekkay, Touhami
In this work, we have studied the surface of hydrogenated a-Si and phosphorous doped a-Si:H,P. Due to the presence of unstable dangling bonds, these films are oxidized in the air after their preparation. XPS and UPS have been used to study these oxidized surfaces before and after plasma sputtering and wet chemical cleaning. We used deconvolution technique for the analysis of the spectra. First, the composition of a-Si:H films, prepared by plasma deposition at various power levels, has been determined by XPS. It has been found that films deposited using 5 W power contain SiH_4 molecules. This is confirmed by IR measurements. These molecules have not been seen in films prepared with a plasma power above 5 W. The XPS spectra of the surface oxide, before and after 3 keV sputtering by argon show that is impossible to completely remove these surface oxide ions. During sputtering, some oxygen atoms are forward scattered into the silicon substrat and form new oxidation states. UPS has been used to study the valence bands of the oxidized surfaces before and after HF cleaning. Prior to a chemical etch, the valence band analysis of the native SiO_2 indicates the presence of three O(2p) orbitals, in agreement with theory. Two are non-bonding orbitals and the third is associated with weak bonding to Si(3p). Two other orbitals have been identified at 10 eV and 11.8 eV. They correspond to O(2p)-Si(3p) and O(2p)-Si(3s) bonds respectively. A residual film containing -SiH, -SiO, SiOH and non-bonding orbitals has been found, after HF cleaning. A series of a-Si:H films have been doped with phosphine (PH_3). Their corresponding XPS spectra around 130 eV are dominated by the surface and bulk plasmon peaks. Numerical filtering has been used to distinguish between the phosphorous P(2p) peak located at 129.5 eV and the phosphorous oxide peak located at 134 eV. The increase in the intensity of these peaks as the (PH_3) increases indicates that a certain proportion of phosphorous is incorporated into the Si matrix and that the rest is oxidized. The shifts of the bulk Fermi level, E_{rm F}, and the surface Fermi level, E _{rm FS}, vary linearly with (PH_3). The difference between these two straight lines give the potential responsible for the bulk band bending. Close to the surface, the band bending is deduced by varying the detection angle in XPS measurements; a maximum value of 0.2 eV has been found in a depth range of 38 A to 105 A.
Process for the formation of wear- and scuff-resistant carbon coatings
Malaczynski, Gerard W.; Qiu, Xiaohong; Mantese, Joseph V.; Elmoursi, Alaa A.; Hamdi, Aboud H.; Wood, Blake P.; Walter, Kevin C.; Nastasi, Michael A.
1995-01-01
A process for forming an adherent diamond-like carbon coating on a workpiece of suitable material such as an aluminum alloy is disclosed. The workpiece is successively immersed in different plasma atmospheres and subjected to short duration, high voltage, negative electrical potential pulses or constant negative electrical potentials or the like so as to clean the surface of oxygen atoms, implant carbon atoms into the surface of the alloy to form carbide compounds while codepositing a carbonaceous layer on the surface, bombard and remove the carbonaceous layer, and to thereafter deposit a generally amorphous hydrogen-containing carbon layer on the surface of the article.
Surface Cleaning Techniques: Ultra-Trace ICP-MS Sample Preparation and Assay of HDPE
DOE Office of Scientific and Technical Information (OSTI.GOV)
Overman, Nicole R.; Hoppe, Eric W.; Addleman, Raymond S.
2013-06-01
The world’s most sensitive radiation detection and assay systems depend upon ultra-low background (ULB) materials to reduce unwanted radiological backgrounds. Herein, we evaluate methods to clean HDPE, a material of interest to ULB systems and the means to provide rapid assay of surface and bulk contamination. ULB level material and ultra-trace level detection of actinide elements is difficult to attain, due to the introduction of contamination from sample preparation equipment such as pipette tips, sample vials, forceps, etc. and airborne particulate. To date, literature available on the cleaning of such polymeric materials and equipment for ULB applications and ultra-trace analysesmore » is limited. For these reasons, a study has been performed to identify an effective way to remove surface contamination from polymers in an effort to provide improved instrumental detection limits. Inductively Coupled Plasma Mass Spectroscopy (ICP-MS) was utilized to assess the effectiveness of a variety of leachate solutions for removal of inorganic uranium and thorium surface contamination from polymers, specifically high density polyethylene (HDPE). HDPE leaching procedures were tested to optimize contaminant removal of thorium and uranium. Calibration curves for thorium and uranium ranged from 15 ppq (fg/mL) to 1 ppt (pg/mL). Detection limits were calculated at 6 ppq for uranium and 7 ppq for thorium. Results showed the most effective leaching reagent to be clean 6 M nitric acid for 72 hour exposures. Contamination levels for uranium and thorium found in the leachate solutions were significant for ultralow level radiation detection applications.« less
NASA Astrophysics Data System (ADS)
Paranjpe, Nikhil; Alamir, Mohammed; Alonayni, Abdullah; Asmatulu, Eylem; Rahman, Muhammad M.; Asmatulu, Ramazan
2018-03-01
Adhesives are widely utilized materials in aviation, automotive, energy, defense, and marine industries. Adhesive joints are gradually supplanting mechanical fasteners because they are lightweight structures, thus making the assembly lighter and easier. They also act as a sealant to prevent a structural joint from galvanic corrosion and leakages. Adhesive bonds provide high joint strength because of the fact that the load is distributed uniformly on the joint surface, while in mechanical joints, the load is concentrated at one point, thus leading to stress at that point and in turn causing joint failures. This research concentrated on the analysis of bond strength and failure loads in adhesive joint of composite-to-composite surfaces. Different durations of plasma along with the detergent cleaning were conducted on the composite surfaces prior to the adhesive applications and curing processes. The joint strength of the composites increased about 34% when the surface was plasma treated for 12 minutes. It is concluded that the combination of different surface preparations, rather than only one type of surface treatment, provides an ideal joint quality for the composites.
A study on air bubble wetting: Role of surface wettability, surface tension, and ionic surfactants
NASA Astrophysics Data System (ADS)
George, Jijo Easo; Chidangil, Santhosh; George, Sajan D.
2017-07-01
Fabrication of hydrophobic/hydrophilic surfaces by biomimicking nature has attracted significant attention recently due to their potential usage in technologies, ranging from self-cleaning to DNA condensation. Despite the potential applications, compared to surfaces of tailored wettability, less attention has been paid towards development and understanding of air bubble adhesion and its dynamics on surfaces with varying wettability. In this manuscript, following the commonly used approach of oxygen plasma treatment, polydimethylsiloxane surfaces with tunable wettability are prepared. The role of plasma treatment conditions on the surface hydrophilicity and the consequent effect on adhesion dynamics of an underwater air bubble is explored for the first time. The ATR-FTIR spectroscopic analysis reveals that the change in hydrophilicity arises from the chemical modification of the surface, manifested as Si-OH vibrations in the spectra. The thickness of the formed thin liquid film at the surface responsible for the experimentally observed air bubble repellency is estimated from the augmented Young-Laplace equation. The concentration dependent studies using cationic as well as anionic surfactant elucidate that the reduced surface tension of the aqueous solution results in a stable thicker film and causes non-adherence of air bubble to the aerophilic surface. Furthermore, the study carried out to understand the combined effect of plasma treatment and surfactants reveals that even below critical micelle concentration, a negatively charged surface results in air bubble repellency for the anionic surfactant, whereas only enhanced air bubble contact angle is observed for the cationic surfactant.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Grigorian, G. M.; Dyatko, N. A.; Kochetov, I. V., E-mail: kochet@triniti.ru
Radial profiles of the density of metastable atoms Ar({sup 3}P{sub 2}) in the positive column of a dc glow discharge in argon were measured. Gas-discharge glass tubes with clean inner surfaces and surfaces covered with a carbonitride or carbon film were utilized. The parameters of the discharge plasma under experimental conditions were calculated in the framework of a one-dimensional (along the tube radius) discharge model. The coefficient K of reflection of Ar({sup 3}P{sub 2}) atoms from the tube wall was estimated by comparing the measured and calculated density profiles. It is found that, for a clean tube wall, the coefficientmore » of reflection is K = 0.4 ± 0.2, whereas for a wall covered with a carbonitride or carbon film, it is K < 0.2.« less
Canullo, Luigi; Dehner, Jan Friedrich; Penarrocha, David; Checchi, Vittorio; Mazzoni, Annalisa; Breschi, Lorenzo
2016-01-01
The aim of this preliminary prospective RCT was to histologically evaluate peri-implant soft tissues around titanium abutments treated using different cleaning methods. Sixteen patients were randomized into three groups: laboratory customized abutments underwent Plasma of Argon treatment (Plasma Group), laboratory customized abutments underwent cleaning by steam (Steam Group), and abutments were used as they came from industry (Control Group). Seven days after the second surgery, soft tissues around abutments were harvested. Samples were histologically analyzed. Soft tissues surrounding Plasma Group abutments predominantly showed diffuse chronic infiltrate, almost no acute infiltrate, with presence of few polymorphonuclear neutrophil granulocytes, and a diffuse presence of collagenization bands. Similarly, in Steam Group, the histological analysis showed a high variability of inflammatory expression factors. Tissues harvested from Control Group showed presence of few neutrophil granulocytes, moderate presence of lymphocytes, and diffuse collagenization bands in some sections, while they showed absence of acute infiltrate in 40% of sections. However, no statistical difference was found among the tested groups for each parameter (p > 0.05). Within the limit of the present study, results showed no statistically significant difference concerning inflammation and healing tendency between test and control groups.
NASA Astrophysics Data System (ADS)
Qian, Yingjia; Chi, Lina; Zhou, Weili; Yu, Zhenjiang; Zhang, Zhongzhi; Zhang, Zhenjia; Jiang, Zheng
2016-01-01
Surface hydrophilic modification of polymer ultrafiltration membrane using metal oxide represents an effective yet highly challenging solution to improve water flux and antifouling performance. Via plasma-enhanced graft of poly acryl acid (PAA) prior to coating TiO2, we successfully fixed TiO2 functional thin layer on super hydrophobic polytetrafluoroethylene (PTFE) ultrafiltration (UF) membranes. The characterization results evidenced TiO2 attached on the PTFE-based UF membranes through the chelating bidentate coordination between surface-grafted carboxyl group and Ti4+. The TiO2 surface modification may greatly reduce the water contact angle from 115.8° of the PTFE membrane to 35.0° without degradation in 30-day continuous filtration operations. The novel TiO2/PAA/PTFE membranes also exhibited excellent antifouling and self-cleaning performance due to the intrinsic hydrophilicity and photocatalysis properties of TiO2, which was further confirmed by the photo-degradation of MB under Xe lamp irradiation.
Characteristics of a DC-Driven Atmospheric Pressure Air Microplasma Jet
NASA Astrophysics Data System (ADS)
Choi, Jaegu; Matsuo, Keita; Yoshida, Hidekazu; Namihira, Takao; Katsuki, Sunao; Akiyama, Hidenori
2008-08-01
A dc-driven atmospheric pressure air plasma jet has been investigated for some applications, such as local dental treatment, the inner surface treatment of capillaries, stimuli for microorganisms, and the local cleaning of semiconductor devices. The main experimental results are as follows. The discharge in the pulsed mode occurs repetitively despite of the dc input, and the pulsed mode transfers to the continuous mode as the current exceeds a threshold. The measured emission spectrum from the arc column of the air discharge reveals that most energy of activated electrons is used for the excitation of N2 (second positive system bands) and part of the energy for the dissociation of O2. The length of the plasma torch depends on the tube length, inner gap distance, and flow rate. The maximum torch length of about 40 mm is obtained under certain conditions. The spatial distributions of plasma gas temperature are measured and confirmed by the visualization of the gas flow using Schlieren images. Furthermore, surface treatment and decolorization using the generated plasma torch are carried out, focusing on industrial applications.
Lei, Hao; Jones, Rachael M; Li, Yuguo
2017-01-18
Cleaning of environmental surfaces in hospitals is important for the control of methicillin-resistant Staphylococcus aureus (MRSA) and other hospital-acquired infections transmitted by the contact route. Guidance regarding the best approaches for cleaning, however, is limited. In this study, a mathematical model based on ordinary differential equations was constructed to study MRSA concentration dynamics on high-touch and low-touch surfaces, and on the hands and noses of two patients (in two hospitals rooms) and a health care worker in a hypothetical hospital environment. Two cleaning interventions - whole room cleaning and wipe cleaning of touched surfaces - were considered. The performance of the cleaning interventions was indicated by a reduction in MRSA on the nose of a susceptible patient, relative to no intervention. Whole room cleaning just before first patient care activities of the day was more effective than whole room cleaning at other times, but even with 100% efficiency, whole room cleaning only reduced the number of MRSA transmitted to the susceptible patient by 54%. Frequent wipe cleaning of touched surfaces was shown to be more effective that whole room cleaning because surfaces are rapidly re-contaminated with MRSA after cleaning. Wipe cleaning high-touch surfaces was more effective than wipe cleaning low-touch surfaces for the same frequency of cleaning. For low wipe cleaning frequency (≤3 times per hour), high-touch surfaces should be targeted, but for high wipe cleaning frequency (>3 times per hour), cleaning should target high- and low-touch surfaces in proportion to the surface touch frequency. This study reproduces the observations from a field study of room cleaning, which provides support for the validity of our findings. Daily whole room cleaning, even with 100% cleaning efficiency, provides limited reduction in the number of MRSA transmitted to susceptible patients via the contact route; and should be supplemented with frequent targeted cleaning of high-touch surfaces, such as by a wipe or cloth containing disinfectant.
Investigation of photolithography process on SPOs for the Athena mission
NASA Astrophysics Data System (ADS)
Massahi, S.; Girou, D. A.; Ferreira, D. D. M.; Christensen, F. E.; Jakobsen, A. C.; Shortt, B.; Collon, M.; Landgraf, B.
2015-09-01
As part of the ongoing effort to optimize the throughput of the Athena optics we have produced mirrors with a state-of-the-art cleaning process. We report on the studies related to the importance of the photolithographic process. Pre-coating characterization of the mirrors has shown and still shows photoresist remnants on the SiO2- rib bonding zones, which influences the quality of the metallic coating and ultimately the mirror performance. The size of the photoresist remnants is on the order of 10 nm which is about half the thickness of final metallic coating. An improved photoresist process has been developed including cleaning with O2 plasma in order to remove the remaining photoresist remnants prior to coating. Surface roughness results indicate that the SiO2-rib bonding zones are as clean as before the photolithography process is performed.
Method of processing a substrate
Babayan, Steven E [Huntington Beach, CA; Hicks, Robert F [Los Angeles, CA
2008-02-12
The invention is embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and a substrate or work piece is placed in the gas flow downstream of the electrodes, such that said substrate or work piece is substantially uniformly contacted across a large surface area with the reactive gases emanating therefrom. The invention is also embodied in a plasma flow device or reactor having a housing that contains conductive electrodes with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and one of the grounded electrodes contains a means of mixing in other chemical precursors to combine with the plasma stream, and a substrate or work piece placed in the gas flow downstream of the electrodes, such that said substrate or work piece is contacted by the reactive gases emanating therefrom. In one embodiment, the plasma flow device removes organic materials from a substrate or work piece, and is a stripping or cleaning device. In another embodiment, the plasma flow device kills biological microorganisms on a substrate or work piece, and is a sterilization device. In another embodiment, the plasma flow device activates the surface of a substrate or work piece, and is a surface activation device. In another embodiment, the plasma flow device etches materials from a substrate or work piece, and is a plasma etcher. In another embodiment, the plasma flow device deposits thin films onto a substrate or work piece, and is a plasma-enhanced chemical vapor deposition device or reactor.
NASA Astrophysics Data System (ADS)
Kim, Duk Jae; Park, Jeongwon; Geon Han, Jeon
2016-08-01
We show results of the patterning of graphene layers on poly(ethylene terephthalate) (PET) films through remote atmospheric-pressure dielectric barrier discharge plasma. The size of plasma discharge electrodes was adjusted for large-area and role-to-role-type substrates. Optical emission spectroscopy (OES) was used to analyze the characteristics of charge species in atmospheric-pressure plasma. The OES emission intensity of the O2* peaks (248.8 and 259.3 nm) shows the highest value at the ratio of \\text{N}2:\\text{clean dry air (CDA)} = 100:1 due to the highest plasma discharge. The PET surface roughness and hydrophilic behavior were controlled with CDA flow rate during the process. Although the atmospheric-pressure plasma treatment of the PET film led to an increase in the FT-IR intensity of C-O bonding at 1240 cm-1, the peak intensity at 1710 cm-1 (C=O bonding) decreased. The patterning of graphene layers was confirmed by scanning electron microscopy and Raman spectroscopy.
Development of a new plasma reactor for propene removal
NASA Astrophysics Data System (ADS)
Oukacine, Linda; Tatibouët, Jean-Michel
2008-10-01
The purpose of the study is to develop a new plasma reactor being applied to gas phase pollution abatement, involving a surface dielectric barrier discharge (SDBD) at atmospheric pressure. Propene was chosen as a model pollutant. The system can associate a SDBD with a volume dielectric barrier discharge (VDBD). A specific catalyst can be placed in post-plasma site in order to destroy the residual ozone after use it as a strong oxidant for total oxidation of propene and by-products formed by the plasma reactor. A comparative study has been established between the propene removal efficiency of these two plasma geometries. The results demonstrate that SDBD is a promising system for gas cleaning. The experiments show that ozone production depends on plasma system configuration and indicate the effectiveness of combining SDBD and VDBD. The NOx formation remains very low, whereas ozone formation is the highest for the SDBD. The influence of some materials on the propene removal and the ozone production were studied.
Code of Federal Regulations, 2013 CFR
2013-07-01
... C5F8 C4F8O Plasma Etching 1-Ui 0.80 0.80 0.48 0.14 NA 0.29 0.32 0.37 0.09 NA NA BCF4 NA NA 0.0018 0... NA NA NA NA NA Chamber Cleaning In situ plasma cleaning: 1-Ui NA NA NA NA NA NA 0.23 NA NA NA NA BCF4... NA NA NA NA NA Remote Plasma Cleaning: 1-Ui NA NA NA NA 0.063 NA 0.018 NA NA NA NA BCF4 NA NA NA NA...
LaGraff, John R; Chu-LaGraff, Quynh
2006-05-09
Unlabeled primary immunoglobulin G (IgG) antibodies and its F(ab')2 and Fc fragments were attached to oxygen-plasma-cleaned glass substrates using either microcontact printing (MCP) or physical adsorption during bath application from dilute solutions. Fluorescently labeled secondary IgGs were then bound to surface-immobilized IgG, and the relative surface coverage was determined by measuring the fluorescence intensity. Results indicated that the surface coverage of IgG increased with increasing protein solution concentration for both MCP and bath-applied IgG and that a greater concentration of IgG was transferred to a glass substrate using MCP than during physisorption during bath applications. Scanning force microscopy (SFM) showed that patterned MCP IgG monolayers were 5 nm in height, indicating that IgG molecules lie flat on the substrate. After incubation with a secondary IgG, the overall line thickness increased to around 15 nm, indicating that the secondary IgG was in a more vertical orientation with respect to the substrate. The surface roughness of these MCP patterned IgG bilayers as measured by SFM was observed to increase with increasing surface coverage. Physisorption of IgG to both unmodified patterned polydimethylsiloxane (PDMS) stamps and plasma-cleaned glass substrates was modeled by Langmuir adsorption kinetics yielding IgG binding constants of K(MCP) = 1.7(2) x 10(7) M(-1) and K(bath) = 7.8(7) x 10(5) M(-1), respectively. MCP experiments involving primary F(ab')2 and Fc fragments incubated in fluorescently labeled fragment-specific secondary IgGs were carried out to test for the function and orientation of IgG. Finally, possible origins of MCP stamping defects such as pits, pull outs, droplets, and reverse protein transfer are discussed.
Moreno Fernández, H; Rogler, D; Sauthier, G; Thomasset, M; Dietsch, R; Carlino, V; Pellegrin, E
2018-01-22
Boron carbide (B 4 C) is one of the few materials that is expected to be most resilient with respect to the extremely high brilliance of the photon beam generated by free electron lasers (FELs) and is thus of considerable interest for optical applications in this field. However, as in the case of many other optics operated at light source facilities, B 4 C-coated optics are subject to ubiquitous carbon contaminations. Carbon contaminations represent a serious issue for the operation of FEL beamlines due to severe reduction of photon flux, beam coherence, creation of destructive interference, and scattering losses. A variety of B 4 C cleaning technologies were developed at different laboratories with varying success. We present a study regarding the low-pressure RF plasma cleaning of carbon contaminated B 4 C test samples via inductively coupled O 2 /Ar, H 2 /Ar, and pure O 2 RF plasma produced following previous studies using the same ibss GV10x downstream plasma source. Results regarding the chemistry, morphology as well as other aspects of the B 4 C optical coating before and after the plasma cleaning are reported. We conclude that among the above plasma processes only plasma based on pure O 2 feedstock gas exhibits the required chemical selectivity for maintaining the integrity of the B 4 C optical coatings.
Mouse Cleaning Apparatus and Method
NASA Technical Reports Server (NTRS)
Williams, Glenn L. (Inventor)
2005-01-01
The method of using the mouse pad cleaning apparatus is disclosed and claimed. The method comprises the steps of uncovering the mouse cleaning surface, applying the mouse and ball of the mouse to the cleaning surface, moving the mouse in a rotational pattern on the mouse cleaning surface, removing the mouse form the mouse cleaning surface, washing the cleaning surface, and covering the mouse cleaning surface. A mouse pad cleaning apparatus comprising a plurality of substrates, each said substrate having adhesive thereon, said plurality of substrates residing in and affixed to a receptacle. A single substrate having adhesive, which may be washable or non-washable, thereon may be employed. The washable adhesive may be an organopolysiloxane or gelatinous elastomer.
Hydrogen Storage in Diamond Powder Utilizing Plasma NaF Surface Treatment for Fuel Cell Applications
NASA Astrophysics Data System (ADS)
Leal, David A.; Velez, Angel; Prelas, Mark A.; Gosh, Tushar; Leal-Quiros, E.
2006-12-01
Hydrogen Fuel Cells offer the vital solution to the world's socio-political dependence on oil. Due to existing difficulty in safe and efficient hydrogen storage for fuel cells, storing the hydrogen in hydrocarbon compounds such as artificial diamond is a realistic solution. By treating the surface of the diamond powder with a Sodium Fluoride plasma exposure, the surface of the diamond is cleaned of unwanted molecules. Due to fluorine's electro negativity, the diamond powder is activated and ready for hydrogen absorption. These diamond powder pellets are then placed on a graphite platform that is heated by conduction in a high voltage circuit made of tungsten wire. Then, the injection of hydrogen gas into chamber allows the storage of the Hydrogen on the surface of the diamond powder. By neutron bombardment in the nuclear reactor, or Prompt Gamma Neutron Activation Analysis, the samples are examined for parts per million amounts of hydrogen in the sample. Sodium Fluoride surface treatment allows for higher mass percentage of stored hydrogen in a reliable, resistant structure, such as diamond for fuel cells and permanently alters the diamonds terminal bonds for re-use in the effective storage of hydrogen. The highest stored amount utilizing the NaF plasma surface treatment was 22229 parts per million of hydrogen in the diamond powder which amounts to 2.2229% mass increase.
Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization
2017-01-01
A novel method to form ultrathin, uniform Al2O3 layers on graphene using reversible hydrogen plasma functionalization followed by atomic layer deposition (ALD) is presented. ALD on pristine graphene is known to be a challenge due to the absence of dangling bonds, leading to nonuniform film coverage. We show that hydrogen plasma functionalization of graphene leads to uniform ALD of closed Al2O3 films down to 8 nm in thickness. Hall measurements and Raman spectroscopy reveal that the hydrogen plasma functionalization is reversible upon Al2O3 ALD and subsequent annealing at 400 °C and in this way does not deteriorate the graphene’s charge carrier mobility. This is in contrast with oxygen plasma functionalization, which can lead to a uniform 5 nm thick closed film, but which is not reversible and leads to a reduction of the charge carrier mobility. Density functional theory (DFT) calculations attribute the uniform growth on both H2 and O2 plasma functionalized graphene to the enhanced adsorption of trimethylaluminum (TMA) on these surfaces. A DFT analysis of the possible reaction pathways for TMA precursor adsorption on hydrogenated graphene predicts a binding mechanism that cleans off the hydrogen functionalities from the surface, which explains the observed reversibility of the hydrogen plasma functionalization upon Al2O3 ALD. PMID:28405059
NASA Technical Reports Server (NTRS)
Mardesich, N.; Garcia, A.; Bunyan, S.; Pepe, A.
1979-01-01
The technological readiness of the proposed process sequence was reviewed. Process steps evaluated include: (1) plasma etching to establish a standard surface; (2) forming junctions by diffusion from an N-type polymeric spray-on source; (3) forming a p+ back contact by firing a screen printed aluminum paste; (4) forming screen printed front contacts after cleaning the back aluminum and removing the diffusion oxide; (5) cleaning the junction by a laser scribe operation; (6) forming an antireflection coating by baking a polymeric spray-on film; (7) ultrasonically tin padding the cells; and (8) assembling cell strings into solar circuits using ethylene vinyl acetate as an encapsulant and laminating medium.
Large-Area Atomic Oxygen Facility Used to Clean Fire-Damaged Artwork
NASA Technical Reports Server (NTRS)
Rutledge, Sharon K.; Banks, Bruce A.; Steuber, Thomas J.; Sechkar, Edward A.
2000-01-01
In addition to completely destroying artwork, fires in museums and public buildings can soil a displayed artwork with so much accumulated soot that it can no longer be used for study or be enjoyed by the public. In situations where the surface has not undergone extensive charring or melting, restoration can be attempted. However, soot deposits can be very difficult to remove from some types of painted surfaces, particularly when the paint is fragile or flaking or when the top surface of the paint binder has been damaged. Restoration typically involves the use of organic solvents to clean the surface, but these solvents may cause the paint layers to swell or leach out. Also, immersion of the surface or swabbing during solvent cleaning may move or remove pigment through mechanical contact, especially if the fire damage extends into the paint binder. A noncontact technique of removing organic deposits from surfaces was developed out of NASA research on the effects of oxygen atoms on various materials. Atomic oxygen is present in the atmosphere surrounding the Earth at the altitudes where satellites typically orbit. It can react chemically with surface coatings or deposits that contain carbon. In the reaction, the carbon is converted to carbon monoxide and some carbon dioxide. Water vapor is also a byproduct of the reaction if the surface contains carbon-hydrogen bonds. To study this reaction, NASA developed Earth-based facilities to produce atomic oxygen for material exposure and testing. A vacuum facility designed and built by the Electro-Physics Branch of the NASA Glenn Research Center at Lewis Field to provide atomic oxygen over a large area for studying reactions in low Earth orbit has been used to successfully clean several full-size paintings. (This facility can accommodate paintings up to 1.5 by 2.1 m. The atomic oxygen plasma is produced between two large parallel aluminum plates using a radiofrequency power source operating at roughly 400 W. Atomic oxygen is generated uniformly over this area at an operating pressure of 1 to 5 mtorr.
Code of Federal Regulations, 2012 CFR
2012-07-01
... C4F6 C5F8 C4F8O Plasma Etching 1-Ui 0.69 0.56 0.38 0.093 NA 0.25 0.038 0.20 0.14 NA NA BCF4 NA 0.23 0... NA NA NA NA NA NA NA Chamber Cleaning In situ plasma cleaning: 1-Ui 0.92 0.55 NA NA 0.40 0.10 0.18 NA... BC3F8 NA NA NA NA NA NA NA NA NA NA NA Remote plasma cleaning: 1-Ui NA NA NA NA NA NA 0.018 NA NA NA NA...
Code of Federal Regulations, 2013 CFR
2013-07-01
... C4F6 C5F8 C4F8O Plasma Etching 1-Ui 0.69 0.56 0.38 0.093 NA 0.25 0.038 0.20 0.14 NA NA BCF4 NA 0.23 0... NA NA NA NA NA NA NA Chamber Cleaning In situ plasma cleaning: 1-Ui 0.92 0.55 NA NA 0.40 0.10 0.18 NA... BC3F8 NA NA NA NA NA NA NA NA NA NA NA Remote plasma cleaning: 1-Ui NA NA NA NA NA NA 0.018 NA NA NA NA...
Li, Chien-Yu; Cheng, Min-Yu; Houng, Mau-Phon; Yang, Cheng-Fu; Liu, Jing
2018-01-01
In this study, the design and fabrication of AZO/n-Si Schottky barrier diodes (SBDs) with hydrogen plasma treatment on silicon surface and AlxOx guard ring were presented. The Si surface exhibited less interface defects after the cleaning process following with 30 w of H2 plasma treatment that improved the switching properties of the following formed SBDs. The rapid thermal annealing experiment also held at 400 °C to enhance the breakdown voltage of SBDs. The edge effect of the SBDs was also suppressed with the AlxOx guard ring structure deposited by the atomic layer deposition (ALD) at the side of the SBDs. Experimental results show that the reverse leakage current was reduced and the breakdown voltage increased with an addition of the AlxOx guard ring. The diode and fabrication technology developed in the study were applicable to the realization of SBDs with a high breakdown voltage (>200 V), a low reverse leakage current density (≤72 μA/mm2@100 V), and a Schottky barrier height of 1.074 eV. PMID:29316726
Li, Chien-Yu; Cheng, Min-Yu; Houng, Mau-Phon; Yang, Cheng-Fu; Liu, Jing
2018-01-08
In this study, the design and fabrication of AZO/n-Si Schottky barrier diodes (SBDs) with hydrogen plasma treatment on silicon surface and Al x O x guard ring were presented. The Si surface exhibited less interface defects after the cleaning process following with 30 w of H₂ plasma treatment that improved the switching properties of the following formed SBDs. The rapid thermal annealing experiment also held at 400 °C to enhance the breakdown voltage of SBDs. The edge effect of the SBDs was also suppressed with the Al x O x guard ring structure deposited by the atomic layer deposition (ALD) at the side of the SBDs. Experimental results show that the reverse leakage current was reduced and the breakdown voltage increased with an addition of the Al x O x guard ring. The diode and fabrication technology developed in the study were applicable to the realization of SBDs with a high breakdown voltage (>200 V), a low reverse leakage current density (≤72 μA/mm²@100 V), and a Schottky barrier height of 1.074 eV.
Neutral beam dump with cathodic arc titanium gettering
DOE Office of Scientific and Technical Information (OSTI.GOV)
Smirnov, A.; Korepanov, S. A.; Putvinski, S.
An incomplete neutral beam capture can degrade the plasma performance in neutral beam driven plasma machines. The beam dumps mitigating the shine-through beam recycling must entrap and retain large particle loads while maintaining the beam-exposed surfaces clean of the residual impurities. The cathodic arc gettering, which provides high evaporation rate coupled with a fast time response, is a powerful and versatile technique for depositing clean getter films in vacuum. A compact neutral beam dump utilizing the titanium arc gettering was developed for a field-reversed configuration plasma sustained by 1 MW, 20-40 keV neutral hydrogen beams. The titanium evaporator features amore » new improved design. The beam dump is capable of handling large pulsed gas loads, has a high sorption capacity, and is robust and reliable. With the beam particle flux density of 5 x 10{sup 17} H/(cm{sup 2}s) sustained for 3-10 ms, the beam recycling coefficient, defined as twice the ratio of the hydrogen molecular flux leaving the beam dump to the incident flux of high-energy neutral atoms, is {approx}0.7. The use of the beam dump allows us to significantly reduce the recycling of the shine-through neutral beam as well as to improve the vacuum conditions in the machine.« less
Hain, Nicole; Wesner, Daniel; Druzhinin, Sergey I; Schönherr, Holger
2016-11-01
The impact of surface treatment and modification on surface nanobubble nucleation in water has been addressed by a new combination of fluorescence lifetime imaging microscopy (FLIM) and atomic force microscopy (AFM). In this study, rhodamine 6G (Rh6G)-labeled surface nanobubbles nucleated by the ethanol-water exchange were studied on differently cleaned borosilicate glass, silanized glass as well as self-assembled monolayers on transparent gold by combined AFM-FLIM. While the AFM data confirmed earlier reports on surface nanobubble nucleation, size, and apparent contact angles in dependence of the underlying substrate, the colocalization of these elevated features with highly fluorescent features observed in confocal intensity images added new information. By analyzing the characteristic contributions to the excited state lifetime of Rh6G in decay curves obtained from time-correlated single photon counting (TCSPC) experiments, the characteristic short-lived (<600 ps) component of could be associated with an emission at the gas-water interface. Its colocalization with nanobubble-like features in the AFM height images provides evidence for the observation of gas-filled surface nanobubbles. While piranha-cleaned glass supported nanobubbles, milder UV-ozone or oxygen plasma treatment afforded glass-water interfaces, where no nanobubbles were observed by combined AFM-FLIM. Finally, the number density of nanobubbles scaled inversely with increasing surface hydrophobicity.
Surface cleaning for negative electron affinity GaN photocathode
NASA Astrophysics Data System (ADS)
Qiao, Jianliang; Yin, Yingpeng; Gao, Youtang; Niu, Jun; Qian, Yunsheng; Chang, Benkang
2012-10-01
In the preparation process for negative electron affinity (NEA) GaN photocathode, the surface cleanness is very important to activation, it influences the sensitivity and stability of NEA GaN photocathode. The traditional corrosion methods based on oxidizing and dissolving can't remove oxygen (O) and carbon (C) on GaN surface effectively. How to get an ideal atom clean surface is still an important question at present. The cleaning techniques for GaN photocathode was studied by using NEA photocathode activation system and XPS surface analysis system. The experiment sample is p-type GaN doped with Mg, doped concentration is 1.37×1017 cm-3, the transfer rate is 3.08 cm2/V-S, and the thickness of activation layer is 0.51 μm, the substrate is 300 μm thick sapphire. The sample was dealed with chemical cleaning depuration at first. And to get the atom clean surface, the vacuum heat cleaning process was needed. The methods of chemical cleaning and the vacuum heating cleaning were given in detail. According to the X-ray photoelectron spectroscopy of GaN surface after chemical cleaning and the vacuum degree curve of the activation chamber during the heat cleaning, the cleaning effect and the cleaning mechanism were discussed. After the effective chemical cleaning and the heating of 700 Centigrade degree about 20 minutes in ultrahigh vacuum system, the oxides and carbon contaminants on cathode surface can be removed effectively, and the ideal atom clean surface can be obtained. The purpose of heating depuration process is that not only to get the atom clean GaN surface, but also to guarantee the contents of Ga, N on GaN surface stabilize and to keep the system ultra-high vacuum degree. Because of the volatilization of oxide and carbon impurity on the cathode surface, the vacuum degree curve drops with the rising of temperature on the whole.
Edge profiles and limiter tests in Extrap T2
NASA Astrophysics Data System (ADS)
Bergsåker, H.; Hedin, G.; Ilyinsky, L.; Larsson, D.; Möller, A.
New edge profile measurements, including calorimetric measurements of the parallel heat flux, were made in Extrap T2. Test limiters of pure molybdenum and the TZM molybdenum alloy have been exposed in the edge plasma. The surface damage was studied, mainly by microscopy. Tungsten coated graphite probes were also exposed, and the surfaces were studied by microscopy, ion beam analysis and XPS. In this case cracking and mixing of carbon and tungsten at the interface was observed in the most heated areas, whereas carbide formation at the surface was seen in less heated areas. In these tests pure Mo generally fared better than TZM, and thin and cleaner coatings fared better than thicker and less clean.
First results on plasma-surface interactions in the tokamak de varennes
NASA Astrophysics Data System (ADS)
Terreault, B.; Boucher, C.; Paynter, R. W.; Ross, G. G.; ThÉriault, D.; Abel, G.; Boivin, R.; Bolton, R. A.; Castracane, J.; Chevalier, G.; Couture, P.; Décoste, R.; Demers, Y.; Dimoff, K.; Glaude, V.; Gregory, B. C.; Haddad, E.; Janicki, C.; Kalnavarns, J.; Lachambre, J. L.; Mai, H. H.; Neufeld, C. R.; Pacher, H. D.; Pacher, G. W.; Richard, N.; Saint-Jacques, R. G.; Saint-Onge, M.; Simm, C.; Stansfield, B. L.; Veilleux, G.; Whyte, D.; Zuzak, W.
1989-04-01
Results of plasma-surface interaction studies made during the early phases of operation of the Tokamak de Varennes are summarized. It was found that the desorption of molecules from the internal walls by UV radiation can be used to reduce the base pressure. Auger depth profiling of stainless steel (SS) samples exposed to hydrogen discharge cleaning has been performed. Glow discharges at about 0.1 mbar etch the surface carbon and oxide at a rate of 0.5 nm/h. RF-glow discharges at 10 -3 mbar result in a rapid reduction of the oxide and its replacement by a carbide layer (the graphite limiters being the source of the carbon). Long-term wall samples of SS and Si have been profiled by Auger and nuclear analysis. The SS sample has a similar composition to that exposed to the RF-glow conditioning. The Si sample is covered by a 3 nm deposit of metals, C and O, and contains 10 16 H/cm 2 within 30 nm of the surface; this dose and width are consistent with the history of the sample.
Si-compatible cleaning process for graphene using low-density inductively coupled plasma.
Lim, Yeong-Dae; Lee, Dae-Yeong; Shen, Tian-Zi; Ra, Chang-Ho; Choi, Jae-Young; Yoo, Won Jong
2012-05-22
We report a novel cleaning technique for few-layer graphene (FLG) by using inductively coupled plasma (ICP) of Ar with an extremely low plasma density of 3.5 × 10(8) cm(-3). It is known that conventional capacitively coupled plasma (CCP) treatments destroy the planar symmetry of FLG, giving rise to the generation of defects. However, ICP treatment with extremely low plasma density is able to remove polymer resist residues from FLG within 3 min at a room temperature of 300 K while retaining the carbon sp(2)-bonding of FLG. It is found that the carrier mobility and charge neutrality point of FLG are restored to their pristine defect-free state after the ICP treatment. Considering the application of graphene to silicon-based electronic devices, such a cleaning method can replace thermal vacuum annealing, electrical current annealing, and wet-chemical treatment due to its advantages of being a low-temperature, large-area, high-throughput, and Si-compatible process.
Alternative Solvents and Technologies for Precision Cleaning of Aerospace Components
NASA Technical Reports Server (NTRS)
Grandelli, Heather; Maloney, Phillip; DeVor, Robert; Hintze, Paul
2014-01-01
Precision cleaning solvents for aerospace components and oxygen fuel systems, including currently used Vertrel-MCA, have a negative environmental legacy, high global warming potential, and have polluted cleaning sites. Thus, alternative solvents and technologies are being investigated with the aim of achieving precision contamination levels of less than 1 mg/sq ft. The technologies being evaluated are ultrasonic bath cleaning, plasma cleaning and supercritical carbon dioxide cleaning.
Photoconductivity induced by nanoparticle segregated grain-boundary in spark plasma sintered BiFeO3
NASA Astrophysics Data System (ADS)
Nandy, Subhajit; Mocherla, Pavana S. V.; Sudakar, C.
2017-05-01
Photoconductivity studies on spark plasma sintered BiFeO3 samples with two contrasting morphologies, viz., nanoparticle-segregated grain boundary (BFO-AP) and clean grain boundary (BFO-AA), show that their photo-response is largely influenced by the grain boundary defects. Impedance analyses at 300 K and 573 K clearly demarcate the contributions from grain, grain-boundary, and the nanoparticle-segregated grain-boundary conductivities. I-V characteristics under 1 sun illumination show one order of higher conductivity for BFO-AP, whereas conductivity decreases for BFO-AA sample. Larger photocurrent in BFO-AP is attributed to the extra conduction path provided by oxygen vacancies on the nanoparticle surfaces residing at the grain boundaries. Creation of photo-induced traps under illumination and the absence of surface conduction channels in BFO-AA are surmised to result in a decreased conductivity on illumination.
Bio-Inspired Self-Cleaning Surfaces
NASA Astrophysics Data System (ADS)
Liu, Kesong; Jiang, Lei
2012-08-01
Self-cleaning surfaces have drawn a lot of interest for both fundamental research and practical applications. This review focuses on the recent progress in mechanism, preparation, and application of self-cleaning surfaces. To date, self-cleaning has been demonstrated by the following four conceptual approaches: (a) TiO2-based superhydrophilic self-cleaning, (b) lotus effect self-cleaning (superhydrophobicity with a small sliding angle), (c) gecko setae-inspired self-cleaning, and (d) underwater organisms-inspired antifouling self-cleaning. Although a number of self-cleaning products have been commercialized, the remaining challenges and future outlook of self-cleaning surfaces are also briefly addressed. Through evolution, nature, which has long been a source of inspiration for scientists and engineers, has arrived at what is optimal. We hope this review will stimulate interdisciplinary collaboration among material science, chemistry, biology, physics, nanoscience, engineering, etc., which is essential for the rational design and reproducible construction of bio-inspired multifunctional self-cleaning surfaces in practical applications.
Collective Phenomena In Volume And Surface Barrier Discharges
NASA Astrophysics Data System (ADS)
Kogelschatz, U.
2010-07-01
Barrier discharges are increasingly used as a cost-effective means to produce non-equilibrium plasmas at atmospheric pressure. This way, copious amounts of electrons, ions, free radicals and excited species can be generated without appreciable gas heating. In most applications the barrier is made of dielectric material. In laboratory experiments also the use of resistive, ferroelectric and semiconducting materials has been investigated, also porous ceramic layers and dielectric barriers with controlled surface conductivity. Major applications utilizing mainly dielectric barriers include ozone generation, surface cleaning and modification, polymer and textile treatment, sterilization, pollution control, CO2 lasers, excimer lamps, plasma display panels (flat TV screens). More recent research efforts are also devoted to biomedical applications and to plasma actuators for flow control. Sinu- soidal feeding voltages at various frequencies as well as pulsed excitation schemes are used. Volume as well as surface barrier discharges can exist in the form of filamentary, regularly patterned or laterally homogeneous discharges. Reviews of the subject and the older literature on barrier discharges were published by Kogelschatz (2002, 2003), by Wagner et al. (2003) and by Fridman et al. (2005). A detailed discussion of various properties of barrier discharges can also be found in the recent book "Non-Equilibrium Air Plasmas at Atmospheric Pressure" by Becker et al. (2005). The physical effects leading to collective phenomena in volume and surface barrier discharges will be discussed in detail. Special attention will be given to self-organization of current filaments. Main similarities and differences of the two types of barrier discharges will be elaborated.
Lee, Mun-Hwan; Min, Bong Ki; Son, Jun Sik; Kwon, Tae-Yub
2016-01-01
This in vitro study investigated whether different storage conditions of plasma-treated zirconia specimens affect the shear bond strength of veneering porcelain. Zirconia plates were treated with a non-thermal atmospheric argon plasma (200 W, 600 s). Porcelain veneering (2.38 mm in diameter) was performed immediately (P-I) or after 24 h storage in water (P-W) or air (P-A) on the treated surfaces (n = 10). Untreated plates were used as the control. Each group was further divided into two subgroups according to the application of a ceramic liner. All veneered specimens underwent a shear bond strength (SBS) test. In the X-ray photoelectron spectroscopy (XPS) analysis, the oxygen/carbon ratios of the plasma-treated groups increased in comparison with those of the control group. When a liner was not used, the three plasma-treated groups showed significantly higher SBS values than the control group (p < 0.001), although group P-A exhibited a significantly lower value than the other two groups (p < 0.05). The liner application negatively affected bonding in groups P-I and P-W (p < 0.05). When the veneering step was delayed after plasma treatment of zirconia, storage of the specimens in water was effective in maintaining the cleaned surfaces for optimal bonding with the veneering porcelain. PMID:28787841
Method for cleaning and passivating a metal surface
NASA Technical Reports Server (NTRS)
Alexander, George B. (Inventor); Carpenter, Norman F. (Inventor)
1976-01-01
A cleaning solvent useful in the cleaning of metal surfaces, e.g. nickle-iron alloys, contains sulfamic acid, citric acid, a solvent for hydrocarbon residues, and a surfactant. Metal surfaces are cleaned by contacting the surface with the cleaning solvent and then passivated by contact with aqueous solutions of citric acid or sodium nitrite or a combination of the two.
NASA Astrophysics Data System (ADS)
Lim, Jin-Pyo; Uhm, Han S.; Li, Shou-Zhe
2007-09-01
A nonequilibrium Ar /O2 plasma discharge at atmospheric pressure was carried out in a coaxial cylindrical reactor with a stepped electrode configuration powered by a 13.56MHz rf power supplier. The argon glow discharge with high electron density produces oxygen reactive species in large quantities. Argon plasma jets penetrate deep into ambient air and create a path for oxygen radicals to sterilize microbes. A sterilization experiment with bacterial endospores indicates that an argon-oxygen plasma jet very effectively kills endospores of Bacillus atrophaeus (ATCC 9372), thereby demonstrating its capability to clean surfaces and its usefulness for reinstating contaminated equipment as free from toxic biological warfare agents. The decimal reduction time (D values) of the Ar /O2 plasma jet at an exposure distance of 0.5-1.5cm ranges from 5 to 57s. An actinometric comparison of the sterilization data shows that atomic oxygen radicals play a significant role in plasma sterilization. When observed under a scanning electron microscope, the average size of the spores appears to be greatly reduced due to chemical reactions with the oxygen radicals.
Changing the surface properties on naval steel as result of non-thermal plasma treatment
NASA Astrophysics Data System (ADS)
Hnatiuc, B.; Sabău, A.; Dumitrache, C. L.; Hnatiuc, M.; Crețu, M.; Astanei, D.
2016-08-01
The problem of corrosion, related to Biofouling formation, is an issue with very high importance in the maritime domain. According to new rules, the paints and all the technologies for the conditioning of naval materials must fulfil more restrictive environmental conditions. In order to solve this issue, different new clean technologies have been proposed. Among them, the use of non-thermal plasmas produced at atmospheric pressure plays a very important role. This study concerns the opportunity of plasma treatment for preparation or conditioning of naval steel OL36 type. The plasma reactors chosen for the experiments can operate at atmospheric pressure and are easy to use in industrial conditions. They are based on electrical discharges GlidArc and Spark, which already proved their efficiency for the surface activation or even for coatings of the surface. The non-thermal character of the plasma is ensured by a gas flow blown through the electrical discharges. One power supply has been used for reactors that provide a 5 kV voltage and a maximum current of 100 mA. The modifications of the surface properties and composition have been studied by XPS technique (X-ray Photoelectron Spectroscopy). There were taken into consideration 5 samples: 4 of them undergoing a Mini-torch plasma, a Gliding Spark, a GlidArc with dry air and a GlidArc with CO2, respectively the fifth sample which is the untreated witness. Before the plasma treatment, samples of naval steel were processed in order to obtain mechanical gloss. The time of treatment was chosen to 12 minutes. In the spectroscopic analysis, done on a ULVAC-PHI, Inc. PHI 5000 Versa Probe scanning XPS microprobe, a monocromated Al Kα X-ray source with a spot size of 100 μm2 was used to scan each sample while the photoelectrons were collected at a 45-degree take-off angle. Differences were found between atomic concentrations in each individual case, which proves that the active species produced by each type of plasma affects the surface properties of the treated naval steel.
Self-Cleaning Ceramic Tiles Produced via Stable Coating of TiO₂ Nanoparticles.
Shakeri, Amid; Yip, Darren; Badv, Maryam; Imani, Sara M; Sanjari, Mehdi; Didar, Tohid F
2018-06-13
The high photocatalytic power of TiO₂ nanoparticles has drawn great attention in environmental and medical applications. Coating surfaces with these particles enables us to benefit from self-cleaning properties and decomposition of pollutants. In this paper, two strategies have been introduced to coat ceramic tiles with TiO₂ nanoparticles, and the self-cleaning effect of the surfaces on degradation of an organic dye under ultraviolent (UV) exposure is investigated. In the first approach, a simple one-step heat treatment method is introduced for coating, and different parameters of the heat treatment process are examined. In the second method, TiO₂ nanoparticles are first aminosilanized using (3-Aminopropyl)triethoxysilane (APTES) treatment followed by their covalently attachment onto CO₂ plasma treated ceramic tiles via N -(3-Dimethylaminopropyl)- N ′-ethylcarbodiimide hydrochloride (EDC) and N -Hydroxysuccinimide (NHS) chemistry. We monitor TiO₂ nanoparticle sizes throughout the coating process using dynamic light scattering (DLS) and characterize developed surfaces using X-ray photoelectron spectroscopy (XPS). Moreover, hydrophilicity of the coated surfaces is quantified using a contact angle measurement. It is shown that applying a one-step heat treatment process with the optimum temperature of 200 °C for 5 h results in successful coating of nanoparticles and rapid degradation of dye in a short time. In the second strategy, the APTES treatment creates a stable covalent coating, while the photocatalytic capability of the particles is preserved. The results show that coated ceramic tiles are capable of fully degrading the added dyes under UV exposure in less than 24 h.
High density plasma etching of magnetic devices
NASA Astrophysics Data System (ADS)
Jung, Kee Bum
Magnetic materials such as NiFe (permalloy) or NiFeCo are widely used in the data storage industry. Techniques for submicron patterning are required to develop next generation magnetic devices. The relative chemical inertness of most magnetic materials means they are hard to etch using conventional RIE (Reactive Ion Etching). Therefore ion milling has generally been used across the industry, but this has limitations for magnetic structures with submicron dimensions. In this dissertation, we suggest high density plasmas such as ECR (Electron Cyclotron Resonance) and ICP (Inductively Coupled Plasma) for the etching of magnetic materials (NiFe, NiFeCo, CoFeB, CoSm, CoZr) and other related materials (TaN, CrSi, FeMn), which are employed for magnetic devices like magnetoresistive random access memories (MRAM), magnetic read/write heads, magnetic sensors and microactuators. This research examined the fundamental etch mechanisms occurring in high density plasma processing of magnetic materials by measuring etch rate, surface morphology and surface stoichiometry. However, one concern with using Cl2-based plasma chemistry is the effect of residual chlorine or chlorinated etch residues remaining on the sidewalls of etched features, leading to a degradation of the magnetic properties. To avoid this problem, we employed two different processing methods. The first one is applying several different cleaning procedures, including de-ionized water rinsing or in-situ exposure to H2, O2 or SF6 plasmas. Very stable magnetic properties were achieved over a period of ˜6 months except O2 plasma treated structures, with no evidence of corrosion, provided chlorinated etch residues were removed by post-etch cleaning. The second method is using non-corrosive gas chemistries such as CO/NH3 or CO2/NH3. There is a small chemical contribution to the etch mechanism (i.e. formation of metal carbonyls) as determined by a comparison with Ar and N2 physical sputtering. The discharge should be NH3-rich to achieve the highest etch rates. Several different mask materials were investigated, including photoresist, thermal oxide and deposited oxide. Photoresist etches very rapidly in CO/NH 3 and use of a hard mask is necessary to achieve pattern transfer. Due to its physically dominated nature, the CO/NH3 chemistry appears suited to shallow etch depth (≤0.5mum) applications, but mask erosion leads to sloped feature sidewalls for deeper features.
Interlaminar fracture in carbon fiber/thermoplastic composites
NASA Technical Reports Server (NTRS)
Hinkley, J. A.; Bascom, W. D.; Allred, R. E.
1990-01-01
The surfaces of commercial carbon fibers are generally chemically cleaned or oxidized and then coated with an oligomeric sizing to optimize their adhesion to epoxy matrix resins. Evidence from fractography, from embedded fiber testing and from fracture energies suggests that these standard treatments are relatively ineffective for thermoplastic matrices. This evidence is reviewed and model thermoplastic composites (polyphenylene oxide/high strain carbon fibers) are used to demonstrate how differences in adhesion can lead to a twofold change in interlaminar fracture toughness. The potential for improved adhesion via plasma modification of fiber surfaces is discussed. Finally, a surprising case of fiber-catalyzed resin degradation is described.
Absence of molecular slip on ultraclean and SAM-coated surfaces
NASA Astrophysics Data System (ADS)
Pye, Justin; Wood, Clay; Burton, Justin
2016-11-01
The liquid/solid boundary condition is a complex problem that is becoming increasingly important for the development of nanoscale fluidic devices. Many groups have now measured slip near an interface at nanoscale dimensions using a variety of experimental techniques. In simple systems, large slip lengths are generally measured for non-wetting liquid/solid combinations, but many conflicting measurements and interpretations remain. We have developed a novel pseudo-differential technique using a quartz crystal microbalance (QCM) to measure slip lengths on various surfaces. A drop of one liquid is grown on the QCM in the presence of a second, ambient liquid. We have isolated any anomalous boundary effects such as interfacial slip by choosing two liquids which have identical bulk effects on the QCM frequency and dissipation in the presence of no-slip. Slip lengths are -less than 2 nm- for water (relative to undecane) on all surfaces measured, including plasma cleaned gold, SiO2, and two different self assembled monolayers (SAMs), regardless of contact angle. We also find that surface cleanliness is crucial to accurately measure slip lengths. Additionally, clean glass substrates appear to have a significant adsorbed water layer and SAM surfaces show excess dissipation, possibly associated with contact line motion. In addition to investigating other liquid pairs, future work will include extending this technique to surfaces with independently controllable chemistry and roughness, both of which are known to strongly affect interfacial hydrodynamics.
Modern technologies for improving cleaning and disinfection of environmental surfaces in hospitals.
Boyce, John M
2016-01-01
Experts agree that careful cleaning and disinfection of environmental surfaces are essential elements of effective infection prevention programs. However, traditional manual cleaning and disinfection practices in hospitals are often suboptimal. This is often due in part to a variety of personnel issues that many Environmental Services departments encounter. Failure to follow manufacturer's recommendations for disinfectant use and lack of antimicrobial activity of some disinfectants against healthcare-associated pathogens may also affect the efficacy of disinfection practices. Improved hydrogen peroxide-based liquid surface disinfectants and a combination product containing peracetic acid and hydrogen peroxide are effective alternatives to disinfectants currently in widespread use, and electrolyzed water (hypochlorous acid) and cold atmospheric pressure plasma show potential for use in hospitals. Creating "self-disinfecting" surfaces by coating medical equipment with metals such as copper or silver, or applying liquid compounds that have persistent antimicrobial activity surfaces are additional strategies that require further investigation. Newer "no-touch" (automated) decontamination technologies include aerosol and vaporized hydrogen peroxide, mobile devices that emit continuous ultraviolet (UV-C) light, a pulsed-xenon UV light system, and use of high-intensity narrow-spectrum (405 nm) light. These "no-touch" technologies have been shown to reduce bacterial contamination of surfaces. A micro-condensation hydrogen peroxide system has been associated in multiple studies with reductions in healthcare-associated colonization or infection, while there is more limited evidence of infection reduction by the pulsed-xenon system. A recently completed prospective, randomized controlled trial of continuous UV-C light should help determine the extent to which this technology can reduce healthcare-associated colonization and infections. In conclusion, continued efforts to improve traditional manual disinfection of surfaces are needed. In addition, Environmental Services departments should consider the use of newer disinfectants and no-touch decontamination technologies to improve disinfection of surfaces in healthcare.
NASA Astrophysics Data System (ADS)
Anan'ev, S. S.; Bakshaev, Yu. L.; Bartov, A. V.; Blinov, P. I.; Dan'ko, S. A.; Zhuzhunashvili, A. I.; Kazakov, E. D.; Kalinin, Yu. G.; Kingsep, A. S.; Korolev, V. D.; Mizhiritskii, V. I.; Smirnov, V. P.; Tkachenko, S. I.; Chernenko, A. S.
2008-07-01
Results are presented from experimental studies of a section of a magnetically insulated transmission line (MITL) with a current density of up to 500 MA/cm2 and linear current density of up to 7 MA/cm (the parameters close to those in a fast-Z-pinch-driven fusion reactor projected at Sandia Laboratories). The experiments were performed in the S-300 facility (3 MA, 0.15 Ω, 100 ns). At high linear current densities, the surface of the ohmically heated MITL electrode can explode and a plasma layer can form near the electrode surface. As a result, the MITL can lose its transmission properties due to the shunting of the vacuum gap by the plasma produced. In this series of experiments, the dynamics of the electrode plasma and the dependence of the transmission properties of the MITL on the material and cleanness of the electrode surface were studied. It is shown experimentally that, when the current with a linear density of up to 7 MA/cm begins to flow along a model MITL, the input and output currents differ by less than 10% over a time interval of up to 230 ns for nickel electrodes and up to 350 ns for a line with a gold central electrode. No effect of the oil film present on the electrode surface on the loss of the transmission properties of the line was observed. It is also shown that electron losses insignificantly contribute to the total current balance. The experimental results are compared with calculations of the electrode explosion and the subsequent expansion of the plasma layer. A conclusion is made that the life-time of the model MITL satisfies the requirements imposed on the transmission lines intended for use in the projected thermonuclear reactor.
ATS-6 - Synchronous orbit trapped radiation studies with an electron-proton spectrometer
NASA Technical Reports Server (NTRS)
Walker, R. J.; Swanson, R. L.; Winckler, J. R.; Erickson, K. N.
1975-01-01
The paper discusses the University of Minnesota experiment on ATS-6 designed to study the origin and dynamics of high-energy electrons and protons in the outer radiation belt and in the near-earth plasma sheet. The experiment consists of two nearly identical detector assemblies, each of which is a magnetic spectrometer containing four gold-silicon surface barrier detectors. The instrument provides a clean separation between protons and electrons by the combination of pulse height analysis and magnetic deflection.
Seenama, Chakkraphong; Tachasirinugune, Peenithi; Jintanothaitavorn, Duangporn; Kachintorn, Kanchana; Thamlikitkul, Visanu
2013-02-01
To determine the effectiveness of Virusolve+ disinfectant wipes and PAL disinfectant wipes for decontamination of inoculated bacteria on patients' environmental and medical equipment surfaces at Siriraj Hospital. Tryptic soy broths containing MRSA and XDR A. baumannii were painted onto the surfaces of patient's stainless steel bed rail, patient's fiber footboard, control panel of infusion pump machine and control panel of respirator. The contaminated surfaces were cleaned by either tap water, tap water containing detergent, Virusolve+ disinfectant wipes or PAL disinfectant wipes. The surfaces without any cleaning procedures served as the control surface. The contaminated surfaces cleaned with the aforementioned procedures and control surfaces were swabbed with cotton swabs. The swabs were streaked on agar plates to determine the presence of MRSA and XDR A. baumannii. MRSA and XDR A. baumannii were recovered from all control surfaces. All surfaces cleaned with tap water or tap water containing detergent revealed presence of both MRSA and XDR A. baumannii. However the amounts of bacteria on the surfaces cleaned with tap water containing detergent were less than those cleaned with tap water alone. All surfaces cleaned with PAL disinfectant wipes also revealed presence of both MRSA and XDR A. baumannii. However the amounts of bacteria on the surfaces cleaned with PAL disinfectant wipes were less than those cleaned with tap water containing detergent. No bacteria were recovered from all surfaces cleaned with Virusolve+ disinfectant wipes. Virusolve+ disinfectant wipes were more effective than tap water; tap water containing detergent and PAL disinfectant wipes for decontamination of bacteria inoculated on patients environmental and medical equipment surfaces at Siriraj Hospital.
Laser Ablation Cleaning of Self-Reacting Friction Stir Weld Seam Surfaces: A Preliminary Evaluation
NASA Technical Reports Server (NTRS)
Nunes, A. C., Jr.; Russell, C. K.; Brooke, S. A.; Parry, Q.; Lowrey, N. M.
2014-01-01
Anodized aluminum panels were cleaned by three lasers at three separate sites with a view to determining whether more economical laser cleaning might supplant current manual cleaning methods for preparation of surfaces to be welded by the self-reacting friction stir process. Uncleaned panels yielded welds exhibiting residual oxide defect (ROD) and failing at very low stresses along the trace of the weld seam. Manually cleaned panels yielded welds without ROD; these welds failed at nominal stress levels along an angled fracture surface not following the weld seam trace. Laser cleaned panels yielded welds failing at intermediate stress levels. The inadequacy of the laser cleaning processes leaves questions: Was the anodized aluminum test too stringent to represent actual cleaning requirements? Were the wrong laser cleaning techniques/parameters used for the study? Is the laser cleaning mechanism inadequate for effective preweld surface cleaning?
Investigation of aluminum surface cleaning using cavitating fluid flow
DOE Office of Scientific and Technical Information (OSTI.GOV)
Ralys, Aurimas; Striška, Vytautas; Mokšin, Vadim
This paper investigates efficiency of specially designed atomizer used to spray water and cavitate microbubbles in water flow. Surface cleaning system was used to clean machined (grinded) aluminum surface from abrasive particles. It is established that cleaning efficiency depends on diameter of the diffuser, water pressure and distance between nozzle and metal surface. It is obtained that the best cleaning efficiency (100%) is achieved at pressure 36 bar, when diameter of diffuser is 0.4 mm and distance between nozzle and surface is 1 mm. It is also established that satisfactory cleaning efficiency (80%) is achieved not only when atomizer ismore » placed closer to metal surface, but also at larger (120 mm) distances.« less
High-density plasma deposition manufacturing productivity improvement
NASA Astrophysics Data System (ADS)
Olmer, Leonard J.; Hudson, Chris P.
1999-09-01
High Density Plasma (HDP) deposition provides a means to deposit high quality dielectrics meeting submicron gap fill requirements. But, compared to traditional PECVD processing, HDP is relatively expensive due to the higher capital cost of the equipment. In order to keep processing costs low, it became necessary to maximize the wafer throughput of HDP processing without degrading the film properties. The approach taken was to optimize the post deposition microwave in-situ clean efficiency. A regression model, based on actual data, indicated that number of wafers processed before a chamber clean was the dominant factor. Furthermore, a design change in the ceramic hardware, surrounding the electrostatic chuck, provided thermal isolation resulting in an enhanced clean rate of the chamber process kit. An infra-red detector located in the chamber exhaust line provided a means to endpoint the clean and in-film particle data confirmed the infra-red results. The combination of increased chamber clean frequency, optimized clean time and improved process.
Surface-mediated molecular events in material-induced blood-plasma coagulation
NASA Astrophysics Data System (ADS)
Chatterjee, Kaushik
Coagulation and thrombosis persist as major impediments associated with the use of blood-contacting medical devices. We are investigating the molecular mechanism underlying material-induced blood-plasma coagulation focusing on the role of the surface as a step towards prospective development of improved hemocompatible biomaterials. A classic observation in hematology is that blood/blood-plasma in contact with clean glass surface clots faster than when in contact with many plastic surfaces. The traditional biochemical theory explaining the underlying molecular mechanism suggests that hydrophilic surfaces, like that of glass, are specific activators of the coagulation cascade because of the negatively-charged groups on the surface. Hydrophobic surfaces are poor procoagulants or essentially "benign" because they lack anionic groups. Further, these negatively-charged surfaces are believed to not only activate blood factor XII (FXII), the key protein in contact activation, but also play a cofactor role in the amplification and propagation reactions that ultimately lead to clot formation. In sharp contrast to the traditional theory, our investigations indicate a need for a paradigm shift in the proposed sequence of contact activation events to incorporate the role of protein adsorption at the material surfaces. These studies have lead to the central hypothesis for this work proposing that protein adsorption to hydrophobic surfaces attenuates the contact activation reactions so that poorly-adsorbent hydrophilic surfaces appear to be stronger procoagulants relative to hydrophobic surfaces. Our preliminary studies measuring the plasma coagulation response of activated FXII (FXIIa) on different model surfaces suggested that the material did not play a cofactor role in the processing of this enzyme dose through the coagulation pathway. Therefore, we focused our efforts on studying the mechanism of initial production of enzyme at the procoagulant surface. Calculations for the amounts of FXIIa generated at material surfaces in plasma using a mathematical model for measured coagulation responses indicate that the relative contributions of the individual pathways of enzyme generation are similar at both hydrophilic and hydrophobic surfaces, only the amounts of enzyme generated scale with surface energy and area of the activating surface. Further, from direct measurement of enzyme activation at test surfaces we observed that contact activation reactions are not specific to negatively-charged hydrophilic surfaces. Rather, the molecular interactions are attenuated at hydrophobic surfaces due to protein adsorption so that poorly-adsorbent hydrophilic surfaces exhibit an apparent specificity for contact activation reactions. Preliminary studies were preformed to assay the plasma coagulation response to low-fouling surfaces prepared by either grafting poly(ethylene glycol) chains or using zwitterions. Results indicate that poly(ethylene glycol)-modified surfaces are significantly weaker procoagulants than surfaces containing zwitterions underscoring a need to specifically evaluate the coagulation response despite similarities in observed protein adsorption to both surfaces. In summary, our studies demonstrate a need to incorporate protein-adsorption competition at procoagulant surfaces into the mechanism of contact activation to account for the observed moderation of FXII activation by blood proteins unrelated to the plasma coagulation cascade.
Plasma and catalyst for the oxidation of NOx
NASA Astrophysics Data System (ADS)
Jõgi, Indrek; Erme, Kalev; Levoll, Erik; Raud, Jüri; Stamate, Eugen
2018-03-01
Efficient exhaust gas cleaning from NO x (NO and NO2) by absorption and adsorption based methods requires the oxidation of NO. The application of non-thermal plasma is considered as a promising oxidation method but the oxidation of NO by direct plasma remains limited due to the back-reaction of NO2 to NO mediated by O radicals in plasma. Indirect NO oxidation by plasma produced ozone allows to circumvent the back-reaction and further oxidize NO2 to N2O5 but the slow reaction rate for the latter process limits the efficiency of this process. Present paper gives an overview of the role of metal-oxide catalysts in the improvement of oxidation efficiency for both direct and indirect plasma oxidation of NO x . The plasma produced active oxygen species (O, O3) were shown to play an important role in the reactions taking place on the catalyst surfaces while the exact mechanism and extent of the effect were different for direct and indirect oxidation. In the case of direct plasma oxidation, both short and long lifetime oxygen species could reach the catalyst and participate in the oxidation of NO to NO2. The back-reaction in the plasma phase remained still important factor and limited the effect of catalyst. In the case of indirect oxidation, only ozone could reach the catalyst surface and improve the oxidation of NO2 to N2O5. The effect of catalyst at different experimental conditions was quantitatively described with the aid of simple global chemical kinetic models derived for the NO x oxidation either by plasma or ozone. The models allowed to compare the effect of different catalysts and to analyze the limitations for the efficiency improvement by catalyst.
Self-cleaning of Surfaces: the Role of Surface Wettability and Dust Types
NASA Astrophysics Data System (ADS)
Quan, Yun-Yun; Zhang, Li-Zhi; Qi, Rong-Hui; Cai, Rong-Rong
2016-12-01
The self-cleaning property is usually connected to superhydrophobic surfaces (SHSs) where the dust particles can be easily removed by the rolling motion of droplets. It seems that superhydrophobicity (its durability is questionable nowadays) is a necessity. However here, it is disclosed that self-cleaning can also be realized on an ordinary surface by droplet impinging. The effects of surface wettability and the types of dust particles are considered. The self-cleaning is realized by two steps: (1) the pickup of particles by the water-air interface of an impinging droplet, (2) the release of the impinging droplets from the surface. It can be observed that only the trailing edges of the droplets can pick up particles when the droplets recoil from the inclined surfaces. The hydrophilic surface can also achieve self-cleaning under some conditions. This interesting finding may be helpful for the successful implementation of self-cleaning with common surfaces.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Geng, Zhi; Graduate University of Chinese Academy of Sciences; He, Junhui, E-mail: jhhe@mail.ipc.ac.cn
2012-06-15
Graphical abstract: Self-cleaning and antireflection properties were successfully achieved by assembling (PDDA/S-20){sub n} coatings on PMMA substrates followed by oxygen plasma treatment. Highlights: ► Porous silica coatings were created by layer-by-layer assembly on PMMA substrates. ► Silica coatings were treated by oxygen plasma. ► Porous silica coatings were highly antireflective and superhydrophilic on PMMA substrates. -- Abstract: Silica nanoparticles of ca. 20 nm in size were synthesized, from which hierarchically porous silica coatings were fabricated on poly(methyl methacrylate) (PMMA) substrates via layer-by-layer (LbL) assembly followed by oxygen plasma treatment. These porous silica coatings were highly transparent and superhydrophilic. The maximummore » transmittance reached as high as 99%, whereas that of the PMMA substrate is only 92%. After oxygen plasma treatment, the time for a water droplet to spread to a contact angle of lower than 5° decreased to as short as 0.5 s. Scanning and transmission electron microscopy were used to observe the morphology and structure of nanoparticles and coating surfaces. Transmission and reflection spectra were recorded on UV–vis spectrophotometer. Surface wettability was studied by a contact angle/interface system. The influence of mesopores on the transmittance and wetting properties of coatings was discussed on the basis of experimental observations.« less
NASA Astrophysics Data System (ADS)
Jain, Naman; Singh, Vinay Kumar; Chauhan, Sakshi
2017-12-01
Basalt fiber is emerging out the new reinforcing material for composites. To overcome some of the disadvantages of fibers such as poor bonding to polymers, low thermal stability and high moisture absorption fiber characteristics are modified with chemical, thermal and additive treatments. Chemical treatment corrosive resistance to alkali and acid were investigated which were used to clean and modify the surface of fiber for higher bonding with resins. To improve the thermal stability and reduce moisture uptake thermal treatment such as plasma and non thermal plasma were used which increased the surface roughness and change the chemical composition of surface of basalt fiber. Additive treatment is used to improve the mechanical properties of fibers, in basalt fiber additive treatment was done with SiO2 additive because of its chemical composition which contains major content of SiO2. In present investigation review on the effect of different treatment such as chemical, thermal and additive were studied. Effect of these treatment on chemical composition of the surface of basalt fiber and corrosion to acidic and alkali solution were studied with their effect on mechanical properties of basalt fiber and their composite.
Chapter 8: Plasma operation and control
NASA Astrophysics Data System (ADS)
ITER Physics Expert Group on Disruptions, Control, Plasma, and MHD; ITER Physics Expert Group on Energetic Particles, Heating, Current and Drive; ITER Physics Expert Group on Diagnostics; ITER Physics Basis Editors
1999-12-01
Wall conditioning of fusion devices involves removal of desorbable hydrogen isotopes and impurities from interior device surfaces to permit reliable plasma operation. Techniques used in present devices include baking, metal film gettering, deposition of thin films of low-Z material, pulse discharge cleaning, glow discharge cleaning, radio frequency discharge cleaning, and in situ limiter and divertor pumping. Although wall conditioning techniques have become increasingly sophisticated, a reactor scale facility will involve significant new challenges, including the development of techniques applicable in the presence of a magnetic field and of methods for efficient removal of tritium incorporated into co-deposited layers on plasma facing components and their support structures. The current status of various approaches is reviewed, and the implications for reactor scale devices are summarized. Creation and magnetic control of shaped and vertically unstable elongated plasmas have been mastered in many present tokamaks. The physics of equilibrium control for reactor scale plasmas will rely on the same principles, but will face additional challenges, exemplified by the ITER/FDR design. The absolute positioning of outermost flux surface and divertor strike points will have to be precise and reliable in view of the high heat fluxes at the separatrix. Long pulses will require minimal control actions, to reduce accumulation of AC losses in superconducting PF and TF coils. To this end, more complex feedback controllers are envisaged, and the experimental validation of the plasma equilibrium response models on which such controllers are designed is encouraging. Present simulation codes provide an adequate platform on which equilibrium response techniques can be validated. Burning plasmas require kinetic control in addition to traditional magnetic shape and position control. Kinetic control refers to measures controlling density, rotation and temperature in the plasma core as well as in plasma periphery and divertor. The planned diagnostics (Chapter 7) serve as sensors for kinetic control, while gas and pellet fuelling, auxiliary power and angular momentum input, impurity injection, and non-inductive current drive constitute the control actuators. For example, in an ignited plasma, core density controls fusion power output. Kinetic control algorithms vary according to the plasma state, e.g. H- or L-mode. Generally, present facilities have demonstrated the kinetic control methods required for a reactor scale device. Plasma initiation - breakdown, burnthrough and initial current ramp - in reactor scale tokamaks will not involve physics differing from that found in present day devices. For ITER, the induced electric field in the chamber will be ~0.3V· m-1 - comparable to that required by breakdown theory but somewhat smaller than in present devices. Thus, a start-up 3MW electron cyclotron heating system will be employed to assure burnthrough. Simulations show that plasma current ramp up and termination in a reactor scale device can follow procedures developed to avoid disruption in present devices. In particular, simulations remain in the stable area of the li-q plane. For design purposes, the resistive V·s consumed during initiation is found, by experiments, to follow the Ejima expression, 0.45μ0 RIp. Advanced tokamak control has two distinct goals. First, control of density, auxiliary power, and inductive current ramping to attain reverse shear q profiles and internal transport barriers, which persist until dissipated by magnetic flux diffusion. Such internal transport barriers can lead to transient ignition. Second, combined use poloidal field shape control with non-inductive current drive and NBI angular momentum injection to create and control steady state, high bootstrap fraction, reverse shear discharges. Active n = 1 magnetic feedback and/or driven rotation will be required to suppress resistive wall modes for steady state plasmas that must operate in the wall stabilized regime for reactor levels of β >= 0.03.
Federal Register 2010, 2011, 2012, 2013, 2014
2010-04-12
... of Appalachian Surface Coal Mining Operations under the Clean Water Act, National Environmental... Appalachian Surface Coal Mining Operations under the Clean Water Act, National Environmental Policy Act, and... coal mining operations under the Clean Water Act, National Environmental Policy Act, and the...
Study of radiative heat transfer in Ångström- and nanometre-sized gaps
Cui, Longji; Jeong, Wonho; Fernández-Hurtado, Víctor; ...
2017-02-15
Radiative heat transfer in Ångström- and nanometre-sized gaps is of great interest because of both its technological importance and open questions regarding the physics of energy transfer in this regime. Here in this paper we report studies of radiative heat transfer in few Å to 5nm gap sizes, performed under ultrahigh vacuum conditions between a Au-coated probe featuring embedded nanoscale thermocouples and a heated planar Au substrate that were both subjected to various surface-cleaning procedures. By drawing on the apparent tunnelling barrier height as a signature of cleanliness, we found that upon systematically cleaning via a plasma or locally pushingmore » the tip into the substrate by a few nanometres, the observed radiative conductances decreased from unexpectedly large values to extremely small ones—below the detection limit of our probe—as expected from our computational results. Our results show that it is possible to avoid the confounding effects of surface contamination and systematically study thermal radiation in Ångström- and nanometre-sized gaps.« less
NASA Astrophysics Data System (ADS)
Eibl, Christian; Schmidt, Anke B.; Donath, Markus
2012-10-01
The unoccupied surface electronic structure of clean and oxidized Fe(001) was studied with spin-resolved inverse photoemission and target current spectroscopy. For the clean surface, we detected a dz2 surface state with minority spin character just above the Fermi level, while the image-potential surface state disappears. The opposite is observed for the ordered p(1×1)O/Fe(001) surface: the dz2-type surface state is quenched, while the image-potential state shows up as a pronounced feature. This behavior indicates enhanced surface reflectivity at the oxidized surface. The appearance and disappearance of specific unoccupied surface states prove to be decisive criteria for a clean Fe(001) surface. In addition, enhanced spin asymmetry in the unoccupied states is observed for the oxidized surface. Our results have implications for the use of clean and oxidized Fe(001) films as spin-polarization detectors.
Contamination mitigation strategies for scanning transmission electron microscopy.
Mitchell, D R G
2015-06-01
Modern scanning transmission electron microscopy (STEM) enables imaging and microanalysis at very high magnification. In the case of aberration-corrected STEM, atomic resolution is readily achieved. However, the electron fluxes used may be up to three orders of magnitude greater than those typically employed in conventional STEM. Since specimen contamination often increases with electron flux, specimen cleanliness is a critical factor in obtaining meaningful data when carrying out high magnification STEM. A range of different specimen cleaning methods have been applied to a variety of specimen types. The contamination rate has been measured quantitatively to assess the effectiveness of cleaning. The methods studied include: baking, cooling, plasma cleaning, beam showering and UV/ozone exposure. Of the methods tested, beam showering is rapid, experimentally convenient and very effective on a wide range of specimens. Oxidative plasma cleaning is also very effective and can be applied to specimens on carbon support films, albeit with some care. For electron beam-sensitive materials, cooling may be the method of choice. In most cases, preliminary removal of the bulk of the contamination by methods such as baking or plasma cleaning, followed by beam showering, where necessary, can result in a contamination-free specimen suitable for extended atomic scale imaging and analysis. Copyright © 2015 Elsevier Ltd. All rights reserved.
Particle control and plasma performance in the Lithium Tokamak eXperimenta)
NASA Astrophysics Data System (ADS)
Majeski, R.; Abrams, T.; Boyle, D.; Granstedt, E.; Hare, J.; Jacobson, C. M.; Kaita, R.; Kozub, T.; LeBlanc, B.; Lundberg, D. P.; Lucia, M.; Merino, E.; Schmitt, J.; Stotler, D.; Biewer, T. M.; Canik, J. M.; Gray, T. K.; Maingi, R.; McLean, A. G.; Kubota, S.; Peebles, W. A.; Beiersdorfer, P.; Clementson, J. H. T.; Tritz, K.
2013-05-01
The Lithium Tokamak eXperiment is a small, low aspect ratio tokamak [Majeski et al., Nucl. Fusion 49, 055014 (2009)], which is fitted with a stainless steel-clad copper liner, conformal to the last closed flux surface. The liner can be heated to 350 °C. Several gas fueling systems, including supersonic gas injection and molecular cluster injection, have been studied and produce fueling efficiencies up to 35%. Discharges are strongly affected by wall conditioning. Discharges without lithium wall coatings are limited to plasma currents of order 10 kA, and discharge durations of order 5 ms. With solid lithium coatings discharge currents exceed 70 kA, and discharge durations exceed 30 ms. Heating the lithium wall coating, however, results in a prompt degradation of the discharge, at the melting point of lithium. These results suggest that the simplest approach to implementing liquid lithium walls in a tokamak—thin, evaporated, liquefied coatings of lithium—does not produce an adequately clean surface.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Lim, Jin-Pyo; Uhm, Han S.; Li, Shou-Zhe
2007-09-15
A nonequilibrium Ar/O{sub 2} plasma discharge at atmospheric pressure was carried out in a coaxial cylindrical reactor with a stepped electrode configuration powered by a 13.56 MHz rf power supplier. The argon glow discharge with high electron density produces oxygen reactive species in large quantities. Argon plasma jets penetrate deep into ambient air and create a path for oxygen radicals to sterilize microbes. A sterilization experiment with bacterial endospores indicates that an argon-oxygen plasma jet very effectively kills endospores of Bacillus atrophaeus (ATCC 9372), thereby demonstrating its capability to clean surfaces and its usefulness for reinstating contaminated equipment as freemore » from toxic biological warfare agents. The decimal reduction time (D values) of the Ar/O{sub 2} plasma jet at an exposure distance of 0.5-1.5 cm ranges from 5 to 57 s. An actinometric comparison of the sterilization data shows that atomic oxygen radicals play a significant role in plasma sterilization. When observed under a scanning electron microscope, the average size of the spores appears to be greatly reduced due to chemical reactions with the oxygen radicals.« less
EUV laser produced and induced plasmas for nanolithography
NASA Astrophysics Data System (ADS)
Sizyuk, Tatyana; Hassanein, Ahmed
2017-10-01
EUV produced plasma sources are being extensively studied for the development of new technology for computer chips production. Challenging tasks include optimization of EUV source efficiency, producing powerful source in 2 percentage bandwidth around 13.5 nm for high volume manufacture (HVM), and increasing the lifetime of collecting optics. Mass-limited targets, such as small droplet, allow to reduce contamination of chamber environment and mirror surface damage. However, reducing droplet size limits EUV power output. Our analysis showed the requirement for the target parameters and chamber conditions to achieve 500 W EUV output for HVM. The HEIGHTS package was used for the simulations of laser produced plasma evolution starting from laser interaction with solid target, development and expansion of vapor/plasma plume with accurate optical data calculation, especially in narrow EUV region. Detailed 3D modeling of mix environment including evolution and interplay of plasma produced by lasers from Sn target and plasma produced by in-band and out-of-band EUV radiation in ambient gas, used for the collecting optics protection and cleaning, allowed predicting conditions in entire LPP system. Effect of these conditions on EUV photon absorption and collection was analyzed. This work is supported by the National Science Foundation, PIRE project.
DOE Office of Scientific and Technical Information (OSTI.GOV)
King, Sean W., E-mail: sean.king@intel.com; Tanaka, Satoru; Davis, Robert F.
2015-09-15
Due to the extreme chemical inertness of silicon carbide (SiC), in-situ thermal desorption is commonly utilized as a means to remove surface contamination prior to initiating critical semiconductor processing steps such as epitaxy, gate dielectric formation, and contact metallization. In-situ thermal desorption and silicon sublimation has also recently become a popular method for epitaxial growth of mono and few layer graphene. Accordingly, numerous thermal desorption experiments of various processed silicon carbide surfaces have been performed, but have ignored the presence of hydrogen, which is ubiquitous throughout semiconductor processing. In this regard, the authors have performed a combined temperature programmed desorptionmore » (TPD) and x-ray photoelectron spectroscopy (XPS) investigation of the desorption of molecular hydrogen (H{sub 2}) and various other oxygen, carbon, and fluorine related species from ex-situ aqueous hydrogen fluoride (HF) and in-situ remote hydrogen plasma cleaned 6H-SiC (0001) surfaces. Using XPS, the authors observed that temperatures on the order of 700–1000 °C are needed to fully desorb C-H, C-O and Si-O species from these surfaces. However, using TPD, the authors observed H{sub 2} desorption at both lower temperatures (200–550 °C) as well as higher temperatures (>700 °C). The low temperature H{sub 2} desorption was deconvoluted into multiple desorption states that, based on similarities to H{sub 2} desorption from Si (111), were attributed to silicon mono, di, and trihydride surface species as well as hydrogen trapped by subsurface defects, steps, or dopants. The higher temperature H{sub 2} desorption was similarly attributed to H{sub 2} evolved from surface O-H groups at ∼750 °C as well as the liberation of H{sub 2} during Si-O desorption at temperatures >800 °C. These results indicate that while ex-situ aqueous HF processed 6H-SiC (0001) surfaces annealed at <700 °C remain terminated by some surface C–O and Si–O bonding, they may still exhibit significant chemical reactivity due to the creation of surface dangling bonds resulting from H{sub 2} desorption from previously undetected silicon hydride and surface hydroxide species.« less
Decontamination of Surfaces Exposed to Carbonbased Nanotubes and Nanomaterials
NASA Astrophysics Data System (ADS)
Karimi, Zahra
Contamination of surfaces by nanomaterials can happen due to accidental spillage and release or gradual accumulation during processing or handling. Considering the increasingly wide use of nanomaterials in industry and research labs and also taking into account the diversity of physical and chemical properties of different nanomaterials (such as solubility, aggregation/agglomeration, and surface reactivity), there is a pressing need to define reliable nanomaterial-specific decontamination guidelines. In this project, we propose and investigate a potential method for surface decontamination of carbon-based nanomaterials using solvent cleaning and wipes. The results show that the surfactant-assisted removal efficiencies of multi-walled carbon nanotubes, single walled carbon nantubes and single walled carbon nano-horns from silicon wafers through wiping is greater than 95%, 90% and 78%, respectively. The need for further studies to understand the mechanisms of nanomaterial removal from surfaces and development of standard techniques for surface decontamination of nanomaterials is highlighted. Another phase of experiments were performed to examine the efficiency of surfactants to remove multi-walled carbon nanotubes (MWCNTs) from silicon substrates with nano and microscaled features. In the first set of experiments, nanoscale features were induced on silicon wafers using SF6 and O2 plasma. Atomic force microscopy (AFM) was used to observe the surface topology and roughness. In the second set, well-defined microscale topological features were induced on silicon wafers using photo lithography and plasma etching. The etching time was varied to create semi-ellipsoidal pits with average diameter and height of ~ 7-9 microm, and ~ 1-3 microm, respectively. MWCNTs in the form of liquid solution were deposited on the surface of silicon wafers using the spin coating process. For the cleaning process, the contaminated surfaces were first sprayed with different types of surfactant or water. Then, the MWCNTs were wiped off using a simple wiping mechanism. The areal density of the MWCNTs was quantified prior to and after the removal using scanning electron microscopy (SEM) and post-image processing. For a surface featured with nanoscale asperities, the removal efficiency was measured to be in the range 83-99% based on substrate type and surface roughness. No evident relationship was observed between the etching time and the removal efficiency. For microscale features, increase of the etching time significantly decreases the removal efficiency.
Selective deposition for ''chamber clean-free'' processes using tailored voltage waveform plasmas
NASA Astrophysics Data System (ADS)
Wang, Junkang; v. Johnson, Erik
2016-09-01
Tailored Voltage Waveforms (TVWs) have been proven capable of creating plasma asymmetries in otherwise symmetric CCP reactors. Particularly, sawtooth TVWs (described as having strong slope-asymmetry due to different voltage rise/fall slope) can lead to different sheath dynamics, thus generating strongly asymmetric ionization near each electrode. To date, research concerning the slope-asymmetry has only focused on single-gas plasmas. Herein, we present a study looking at SiF4/H2/Ar mixtures to investigate silicon thin film deposition. The resulting surface process depends strongly on multiple precursors, and the deposition requires a specific balance between surface arrival rates of SiFx and H. For a certain gas flow ratio, we can obtain a deposition rate of 0.82Å/s on one electrode and an etching rate of 1.2Å/s on the other. Moreover, the deposition/etching balance can be controlled by H2 flow and waveform amplitude. This is uniquely possible due to the mixed-gas nature of the process and localized ionization generated by sawtooth TVWs. This encourages the prospect that one could choose process conditions to achieve a variety of desired depositions on one electrode, while leaving the other pristine.
Laser cleaning of the contaminations on the surface of tire mould
NASA Astrophysics Data System (ADS)
Ye, Yayun; Jia, Baoshen; Chen, Jing; Jiang, Yilan; Tang, Hongping; Wang, Haijun; Luan, Xiaoyu; Liao, Wei; Zhang, Chuanchao; Yao, Caizhen
2017-07-01
During the manufacturing of tires, surface pollutants on tire mould will lead to the production of unqualified tires. Tire moulds need to be regularly cleaned. Laser cleaning is recognized as a non-destructive, effective, precise and environmental friendly method. In this paper, laser cleaning was used to remove contaminants on tire mould surface. First, laser induced damage experiments were performed. The results showed that the roughness and hardness of the cast steel sample surface seldom changed under the energy range of 140.1-580.2 mJ laser irradiation 1 pulse and the energy range of 44.7-168.9 mJ laser irradiation 100 pulses. In the laser cleaning experiments, the cleaning thresholds and the optimal cleaning parameters were obtained. Results indicated that laser cleaning was safe and effective for tire mould contamination removal.
The successful of finite element to invent particle cleaning system by air jet in hard disk drive
NASA Astrophysics Data System (ADS)
Jai-Ngam, Nualpun; Tangchaichit, Kaitfa
2018-02-01
Hard Disk Drive manufacturing has faced very challenging with the increasing demand of high capacity drives for Cloud-based storage. Particle adhesion has also become increasingly important in HDD to gain more reliability of storage capacity. The ability to clean on surfaces is more complicated in removing such particles without damaging the surface. This research is aim to improve the particle cleaning in HSA by using finite element to develop the air flow model then invent the prototype of air cleaning system to remove particle from surface. Surface cleaning by air pressure can be applied as alternative for the removal of solid particulate contaminants that is adhering on a solid surface. These technical and economic challenges have driven the process development from traditional way that chemical solvent cleaning. The focus of this study is to develop alternative way from scrub, ultrasonic, mega sonic on surface cleaning principles to serve as a foundation for the development of new processes to meet current state-of-the-art process requirements and minimize the waste from chemical cleaning for environment safety.
Packaging system with cleaning channel and method of making the same
DOE Office of Scientific and Technical Information (OSTI.GOV)
Fang, Lu
A packaging structure and method for surface mount integrated circuits reduces electrochemical migration (ECM) problems by including one or more cleaning channels to effectively and efficiently remove flux residue that may otherwise remain lodged in gaps between the surface mount package and the printed circuit board. A cleaning channel may be formed along a bottom surface of the surface mount package (i.e., the surface facing the printed circuit board), or along a portion of a top surface of the printed circuit board. In either case, the inclusion of a cleaning channel enlarges the gap between the bottom surface of themore » surface mount package and the printed circuit board and creates a path for contaminants to be flushed out during a cleaning process.« less
Self-cleaning efficiency of artificial superhydrophobic surfaces.
Bhushan, Bharat; Jung, Yong Chae; Koch, Kerstin
2009-03-03
The hierarchical structured surface of the lotus (Nelumbo nucifera, Gaertn.) leaf provides a model for the development of biomimetic self-cleaning surfaces. On these water-repellent surfaces, water droplets move easily at a low inclination of the leaf and collect dirt particles adhering to the leaf surface. Flat hydrophilic and hydrophobic, nanostructured, microstructured, and hierarchical structured superhydrophobic surfaces were fabricated, and a systematic study of wettability and adhesion properties was carried out. The influence of contact angle hysteresis on self-cleaning by water droplets was studied at different tilt angles (TA) of the specimen surfaces (3 degrees for Lotus wax, 10 degrees for n-hexatriacontane, as well as 45 degrees for both types of surfaces). At 3 degrees and 10 degrees TA, no surfaces were cleaned by moving water applied onto the surfaces with nearly zero kinetic energy, but most particles were removed from hierarchical structured surfaces, and a certain amount of particles were captured between the asperities of the micro- and hierarchical structured surfaces. After an increase of the TA to 45 degrees (larger than the tilt angles of all structured surfaces), as usually used for industrial self-cleaning tests, all nanostructured surfaces were cleaned by water droplets moving over the surfaces followed by hierarchical and microstructures. Droplets applied onto the surfaces with some pressure removed particles residues and led to self-cleaning by a combination of sliding and rolling droplets. Geometrical scale effects were responsible for superior performance of nanostructured surfaces.
NASA Technical Reports Server (NTRS)
Rutledge, Sharon K.; Banks, Bruce A.; Cales, Michael
1994-01-01
Current techniques for removal of varnish (lacquer) and other organic protective coatings from paintings involve contact with the surface. This contact can remove pigment, or alter the shape and location of paint on the canvas surface. A thermal energy atomic oxygen plasma, developed to simulate the space environment in low Earth orbit, easily removes these organic materials. Uniform removal of organic protective coatings from the surfaces of paintings is accomplished through chemical reaction. Atomic oxygen will not react with oxides so that most paint pigments will not be affected by the reaction. For paintings containing organic pigments, the exposure can be carefully timed so that the removal stops just short of the pigment. Color samples of Alizarin Crimson, Sap Green, and Zinc White coated with Damar lacquer were exposed to atomic oxygen. The lacquer was easily removed from all of the samples. Additionally, no noticeable change in appearance was observed after the lacquer was reapplied. The same observations were made on a painted canvas test sample obtained from the Cleveland Museum of Art. Scanning electron microscope photographs showed a slight microscopic texturing of the vehicle after exposure. However, there was no removal or disturbance of the paint pigment on the surface. It appears that noncontact cleaning using atomic oxygen may provide a viable alternative to other cleaning techniques. It is especially attractive in cases where the organic protective surface cannot be acceptably or safely removed by conventional techniques.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Rodenbeck, Christopher T; Girardi, Michael
Internal nodes of a constituent integrated circuit (IC) package of a multichip module (MCM) are protected from excessive charge during plasma cleaning of the MCM. The protected nodes are coupled to an internal common node of the IC package by respectively associated discharge paths. The common node is connected to a bond pad of the IC package. During MCM assembly, and before plasma cleaning, this bond pad receives a wire bond to a ground bond pad on the MCM substrate.
Environmentally compatible hand wipe cleaning solvents
NASA Technical Reports Server (NTRS)
Clayton, Catherine P.; Kovach, Michael P.
1995-01-01
Several solvents of environmental concern have previously been used for hand wipe cleaning of SRB surfaces, including 1,1,1-trichloroethane, perchloroethylene, toluene, xylene, and MEK. USBI determined the major types of surfaces involved, and qualification requirements of replacement cleaning agents. Nineteen environmentally compatible candidates were tested on 33 material substrates with 26 types of potential surface contaminants, involving over 7,000 individual evaluations. In addition to the cleaning performance evaluation, bonding, compatibility, and corrosion tests were conducted. Results showed that one cleaner was not optimum for all surfaces. In most instances, some of the candidates cleaned better than the 1,1,1-trichloroethane baseline control. Aqueous cleaners generally cleaned better, and were more compatible with nonmetallic materials, such as paints, plastics, and elastomers. Organic base cleaners were better on metal surfaces. Five cleaners have been qualified and are now being implemented in SRB hand wipe cleaning operations.
NASA Technical Reports Server (NTRS)
Miyoshi, Kazuhisa
1998-01-01
This chapter presents the adhesion, friction, and wear behaviors of smooth, atomically clean surfaces of solid-solid couples, such as metal-ceramic couples, in a clean environment. Surface and bulk properties, which determine the adhesion, friction, and wear behaviors of solid-solid couples, are described. The primary emphasis is on the nature and character of the metal, especially its surface energy and ductility. Also, the mechanisms of friction and wear for clean, smooth surfaces are stated.
Hon, Chun-Yip; Chua, Prescillia Ps; Danyluk, Quinn; Astrakianakis, George
2014-06-01
Occupational exposure to antineoplastic drugs has been documented to result in various adverse health effects. Despite the implementation of control measures to minimize exposure, detectable levels of drug residual are still found on hospital work surfaces. Cleaning these surfaces is considered as one means to minimize the exposure potential. However, there are no consistent guiding principles related to cleaning of contaminated surfaces resulting in hospitals to adopt varying practices. As such, this pilot study sought to evaluate current cleaning protocols and identify those factors that were most effective in reducing contamination on drug preparation surfaces. Three cleaning variables were examined: (1) type of cleaning agent (CaviCide®, Phenokil II™, bleach and chlorhexidine), (2) application method of cleaning agent (directly onto surface or indirectly onto a wipe) and (3) use of isopropyl alcohol after cleaning agent application. Known concentrations of antineoplastic drugs (either methotrexate or cyclophosphamide) were placed on a stainless steel swatch and then, systematically, each of the three cleaning variables was tested. Surface wipes were collected and quantified using high-performance liquid chromatography-tandem mass spectrometry to determine the percent residual of drug remaining (with 100% being complete elimination of the drug). No one single cleaning agent proved to be effective in completely eliminating all drug contamination. The method of application had minimal effect on the amount of drug residual. In general, application of isopropyl alcohol after the use of cleaning agent further reduced the level of drug contamination although measureable levels of drug were still found in some cases.
Tebbutt, G. M.
1991-01-01
The performance of agar-contact plates and an alginate-swab method for sampling food surfaces before and after cleaning was compared. Contact plates were more convenient, and were at least as sensitive as the swabbing method. To assess cleaning efficiency repeated sampling was carried out in selected premises, and several cleaning methods were introduced for trial periods. Some surfaces, notably wood and polypropylene, were particularly difficult to clean. For these scrubbing with a nylon brush was the best method. Other surfaces were more easily cleaned, and generally the methods introduced as part of this study were better than the original method used in the premises. Paper proved to be unpopular, and cleaning solutions applied with it did no better than those cleaned with a multiuse cloth kept soaking in a detergent and hypochlorite solution. PMID:1850362
Self-cleaning of superhydrophobic surfaces by spontaneously jumping condensate drops
NASA Astrophysics Data System (ADS)
Wisdom, Katrina; Watson, Jolanta; Watson, Gregory; Chen, Chuan-Hua
2012-11-01
The self-cleaning function of superhydrophobic surfaces is conventionally attributed to the removal of contaminating particles by impacting or rolling water droplets, which implies the action of external forces such as gravity. Here, we demonstrate a new self-cleaning mechanism, whereby condensate drops spontaneously jump upon coalescence on a superhydrophobic surface, and the merged drop self-propels away from the surface along with the contaminants. The jumping-condensate mechanism is shown to autonomously clean superhydrophobic cicada wings, where the contaminating particles cannot be removed by external wind flow. Our findings offer new insights for the development of self-cleaning materials.
Code of Federal Regulations, 2014 CFR
2014-07-01
... Manufacturing: Plasma Etch/Wafer Clean Process Type: CF4 75 CH3F 97 CHF3 97 CH2F2 97 C2F6 97 C3F8 97 C4F6 97 C4F8 97 C5F8 97 SF6 97 NF3 96 All other carbon-based plasma etch/wafer clean fluorinated GHG 60 Chamber...
Optimizing surface finishing processes through the use of novel solvents and systems
NASA Astrophysics Data System (ADS)
Quillen, M.; Holbrook, P.; Moore, J.
2007-03-01
As the semiconductor industry continues to implement the ITRS (International Technology Roadmap for Semiconductors) node targets that go beyond 45nm [1], the need for improved cleanliness between repeated process steps continues to grow. Wafer cleaning challenges cover many applications such as Cu/low-K integration, where trade-offs must be made between dielectric damage and residue by plasma etching and CMP or moisture uptake by aqueous cleaning products. [2-5] Some surface sensitive processes use the Marangoni tool design [6] where a conventional solvent such as IPA (isopropanol), combines with water to provide improved physical properties such as reduced contact angle and surface tension. This paper introduces the use of alternative solvents and their mixtures compared to pure IPA in removing ionics, moisture, and particles using immersion bench-chemistry models of various processes. A novel Eastman proprietary solvent, Eastman methyl acetate is observed to provide improvement in ionic, moisture capture, and particle removal, as compared to conventional IPA. [7] These benefits may be improved relative to pure IPA, simply by the addition of various additives. Some physical properties of the mixtures were found to be relatively unchanged even as measured performance improved. This report presents our attempts to cite and optimize these benefits through the use of laboratory models.
Method and apparatus for monitoring plasma processing operations
Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise
2001-01-01
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.
Method and apparatus for monitoring plasma processing operations
Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise
2001-01-01
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discemible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.
Method and apparatus for monitoring plasma processing operations
Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise
2000-01-01
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.
Method and apparatus for monitoring plasma processing operations
Smith, Jr., Michael Lane; Stevenson, Joel O'Don; Ward, Pamela Peardon Denise
2002-07-16
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.
NASA Astrophysics Data System (ADS)
Asadollahi, Siavash
During the past few decades, plasma-based surface treatment methods have gained a lot of interest in various applications such as thin film deposition, surface etching, surface activation and/or cleaning, etc. Generally, in plasma-based surface treatment methods, high-energy plasma-generated species are utilized to modify the surface structure or the chemical composition of a substrate. Unique physical and chemical characteristics of the plasma along with the high controllability of the process makes plasma treatment approaches very attractive in several industries. Plasma-based treatment methods are currently being used or investigated for a number of practical applications, such as adhesion promotion in auto industry, wound management and cancer treatment in biomedical industry, and coating development in aerospace industry. In this study, a two-step procedure is proposed for the development of superhydrophobic/icephobic coatings based on atmospheric-pressure plasma treatment of aluminum substrates using air and nitrogen plasma. The effects of plasma parameters on various surface properties are studied in order to identify the optimum conditions for maximum coating efficiency against icing and wetting. In the first step, the interactions between air or nitrogen plasma and the aluminum surface are studied. It is shown that by reducing jet-to-substrate distance, air plasma treatment, unlike nitrogen plasma treatment, is capable of creating micro-porous micro-roughened structures on the surface, some of which bear a significant resemblance to the features observed in laser ablation of metals with short and ultra-short laser pulses. The formation of such structures in plasma treatment is attributed to a transportation of energy from the jet to the surface over a very short period of time, in the range of picoseconds to microseconds. This energy transfer is shown to occur through a streamer discharge from the rotating arc source in the jet body to a close proximity of the surface, and then through multiple seemingly random electric arcs on the surface. The formation of these discharges is facilitated by the near-infinite conductivity of the air plasma column. The micro-porous micro-roughened structure developed in this step is then used as the substrate for coating deposition. In the next step, first the plasma jet is slightly modified with a quartz tube surrounding the jet-head. This modification allows for ignition and maintenance of a very weak plasma while hindering the diffusion of oxygen into the plasma and thus increasing the amount of organic deposition on the surface. This is confirmed by the chemical characterization of the surfaces developed using the modified jet. Furthermore, it is shown that this modification can significantly affect surface morphology, leading to a finer surface structure with different levels of roughness. Hydrophobic materials are then deposited on the surface in the presence of HMDSO using nitrogen plasma. Several samples are prepared with different precursor flow rates, plasma generation powers and number of deposition passes. All coatings are characterized regarding their surface morphology, chemical composition, wetting behavior and icephobic characteristics. It is shown that at low precursor flow rates, coating deposition is not enough for a full coverage of the surface. On the other hand, at high flow rates coating deposition can completely cover the surface features originated from the air plasma treatment process, thus negating the effects of an important roughness level. At the median flow rate, which was identified to be 5 g/h, the coating can fully cover the surface while maintaining the pre-existing surface features. It is also shown that by increasing the number of plasma deposition passes, surface features become slightly larger while the amount of organic deposition on the surface increases. Finally, it is shown that in high plasma generation powers, the amount of oxide deposition on the surface increases, leading to lower contact angles and higher ice adhesion strengths. In order to estimate coatings' efficiency in practical applications, coating's stability against some environmental factors is studied. At first, the effects of multiple icing/deicing cycles on surface properties is investigated. SEM studies confirm the removal of the coating material from the surface in all cases after multiple icing/deicing cycles. However, it is shown that the sample resulting from the lowest generation power combined with median flow rate and 3 passes of plasma deposition can maintain its hydrophobicity and icephobicity for up to 10 cycles of icing/deicing. This sample is then exposed to an equivalent of up to 4 years of natural ultraviolet exposure and the effects of UV on surface properties were studied. It is suggested that ultraviolet exposure may be capable of reorganizing the organic functions in the coating structure, leading to shorter siloxane chains with denser methyl functionalization, thus affecting the wetting and icing behavior of the surface. Ice adhesion strength was shown to decrease significantly after the equivalent of 3 years of natural UV exposure. The procedure introduced in this thesis is a cheap, quick, and environmentally friendly method for development of superhydrophobic/icephobic coatings on aluminum substrates. Therefore, it can be easily implemented in several industrial applications where outdoor structures are expected to be exposed to severe icing events.
Goel, Amit; Singh, Atul; Gupta, Tarun
2017-01-01
Background The purpose of this study was to analyze and compare the enamel surface roughness before bonding and after debonding, to find correlation between the adhesive remnant index and its effect on enamel surface roughness and to evaluate which clean-up method is most efficient to provide a smoother enamel surface. Material and Methods 135 premolars were divided into 3 groups containing 45 premolars in each group. Group I was bonded by using moisture insensitive primer, Group II by using conventional orthodontic adhesive and Group III by using self-etching primer. Each group was divided into 3 sub-groups on the basis of type of clean-up method applied i,e scaling followed by polishing, tungsten carbide bur and Sof-Lex disc. Enamel surface roughness was measured and compared before bonding and after clean-up. Results Evaluation of pre bonding and post clean-up enamel surface roughness (Ra value) with the t test showed that Post clean-up Ra values were greater than Pre bonding Ra values in all the groups except in teeth bonded with self-etching primer cleaned with Sof-Lex disc. Reliability of ARI score taken at different time interval tested with Kruskal Wallis test suggested that all the readings were reliable. Conclusions No clean-up procedure was able to restore the enamel to its original smoothness. Self-etching primer and Sof-Lex disc clean-up method combination restored the enamel surface roughness (Ra value) closest to its pre-treatment value. Key words:Enamel surface roughness, clean-up method, adhesive remnant index. PMID:28512535
Martin, U; Sonntag, A-K; Neuhaus, B; Karch, H
2004-10-01
The effectiveness of cleaning and disinfection of environmental surfaces was evaluated in three nursing homes using bacteriological monitoring. Samples from inmates (nose, throat and wounds) and surface cleaning equipment were also taken. Cleaning solutions, disinfectants and cleaning clothes were found to be highly contaminated in two of three institutions. Referring to the surfaces in some cases disinfection didn't reduce bacterial colony counts and seeded MRSA as a potential pathogen in one nursing home. Six MRSA-positive inmates and identical strains were registered in the environment. MRSA can be used as a marker organism to demonstrate effectiveness of cleaning. To achieve further improvement bacteriological monitoring can help in focussing special cleaning and disinfection related problems.
Effectiveness of Surface Cleaning and Disinfection in a Brazilian Healthcare Facility.
Santos-Junior, Aires G; Ferreira, Adriano M; Frota, Oleci P; Rigotti, Marcelo A; Barcelos, Larissa da S; Lopes de Sousa, Alvaro Francisco; de Andrade, Denise; Guerra, Odanir G; R Furlan, Mara C
2018-01-01
Failures in the processes of cleaning and disinfecting health service surfaces may result in the spread and transfer of pathogens that are often associated with healthcare-related infections and outbreaks. To assess the effectiveness of environmental surface cleaning and disinfection in a hospital clinic. The study was conducted in a nursing ward with 45 beds. A total of 80 samples from five high-touch surfaces were evaluated before and after cleaning and disinfection, using the following methods: visual inspection, adenosine triphosphate bioluminescence assay, aerobic colony count, Staphylococcus aureus colony count, and evaluation of resistance to methicillin. The data analysis used nonparametric comparative and correlative tests to observe any differences in the pre- and post- cleaning and disinfection results for the surfaces assessed. Effective cleaning and disinfection had a significant effect on only two surfaces when measured for the presence of adenosine triphosphate, the inner bathroom door handle ( p =0.007) and the toilet bowl ( p =0.01). When evaluated for Staphylococcus aureus colony count, the toilet flush handle also demonstrated a significant effect ( p =0.04). The effectiveness of cleaning and disinfection of the surfaces tested was not satisfactory. An educational intervention is recommended for the cleaning and disinfection staff and the nursing team at the healthcare facility. The data in the study revealed that daily hospital cleaning and disinfection in the sampled sites are not sufficient in medical and surgical wards. Hospital cleanliness must be reevaluated from the point of view of materials, such as an adequate supply of clean cloths, in addition to establishing more precise cleanliness protocols and accurate monitoring systems.
NASA Astrophysics Data System (ADS)
Thompson, William; Stern, Lewis; Ferranti, Dave; Huynh, Chuong; Scipioni, Larry; Notte, John; Sanford, Colin
2010-06-01
Recent helium ion microscope (HIM) imaging studies have shown the strong sensitivity of HIM induced secondary electron (SE) yields [1] to the sample physical and chemical properties and to its surface topography. This SE yield sensitivity is due to the low recoil energy of the HIM initiated electrons and their resulting short mean free path. Additionally, a material's SE escape probability is modulated by changes in the material's work function and surface potential. Due to the escape electrons' roughly 2eV mean energy and their nanometer range mean free path, HIM SE mode image contrast has significant material and surface sensitivity. The latest generation of HIM has a 0.35 nanometer resolution specification and is equipped with a plasma cleaning process to mitigate the effects of hydrocarbon contamination. However, for surfaces that may have native oxide chemistries influencing the secondary electron yield, a new process of low energy, shallow angle argon sputtering, was evaluated. The intent of this work was to study the effect of removing pre-existing native oxides and any in-situ deposited surface contaminants. We will introduce the sputter yield predictions of two established computer models and the sputter yield and sample modification forecasts of the molecular dynamics program, Kalypso. We will review the experimental technique applied to copper samples and show the copper grain contrast improvement that resulted when argon cleaned samples were imaged in HIM SE mode.
Passivation of InSb surface for manufacturing infrared devices
NASA Astrophysics Data System (ADS)
Simchi, H.; Sareminia, Gh.; Shafiekhani, A.; Valizadeh, Gh.
2008-01-01
We studied the reduction of active surface states at the InSb/insulator interface by the reduction of hysteresis in C- V plots and by the performance of InSb diodes operated in photovoltaic mode. The InSb wafers were cleaned with CP4A etchant (HNO 3:CH 3COOH:HF:H 2O at 2:1:1:10). Then layers of 0.4 μm SiO 2, 0.4 μm Si 3N 4 and 0.5 μm Si 3N 4/SiO 2 were deposited on the cleaned surfaced by plasma enhanced chemical vapor deposition (PECVD). After measuring the surface morphology by atomic force microscopy (AFM) the atomic percentage of each element in each compound (e.g. Si and O 2 in SiO 2 layer) was studied by energy-dispersive X-ray spectroscopy (EDX). By using photoemission spectroscopy (XPS), we showed that the SiO 2, Si 3N 4 and Si 3N 4/SiO 2 layers include Sb and/or SbO x and the Sb In antisite during deposition occurred and for this reason their etch rates differ from pure SiO 2, Si 3N 4 and Si 3N 4/SiO 2 layers. Then the gold metal was deposited on the samples and capacitance voltage measurement was made on the MIS samples. The results showed hysteresis free curves if the surface has been cleaned correctly. Finally by depositing the 0.4 μm SiO 2, 0.4 μm Si 3N 4 and 0.5 μm Si 3N 4/SiO 2 on diode structure of InSb, the performance of diode in this case was compared with the anodic oxidation method. The results showed the performance of device is better than for the anodic oxidation method.
Investigation of Coatings for Langmuir Probes in an Oxygen-Rich Space Environment
NASA Astrophysics Data System (ADS)
Samaniego, J. I.; Wang, X.; Andersson, L.; Malaspina, D.; Ergun, R.; Horanyi, M.
2017-12-01
The surface properties of the Langmuir probes, such as the one on the MAVEN mission, will change after exposure to upper planetary atmospheres where high concentrations of atomic oxygen and other oxidizing compounds are present. TiN (Titanium Nitride) or DAG (a resin based graphite dispersion) are the most common coatings for current Langmuir probes, yet both of these coatings pose issues when exposed to oxygen-rich space environment. TiN showed reduced surface conductivity while the DAG layers erode with exposure to oxygen. It is known that Iridium (Ir) and Rhenium (Rh) are difficult to oxidize and maintain high conductivity even in their oxidized forms, suggesting them to be good candidates for probe coatings. Oxidation of most metals creates a resistive layer on the surface of the probe that will affect the amount of current being collected at a given voltage during the probe sweep and therefore affect the accuracy of plasma parameters determined by the Langmuir probe (e.g. density, temperature). We present the results of the oxidation effect on the current-voltage curves (I-V curves) and therefore the resulting measured plasma parameters of Ir and Rh wire probes compared with other control metals and coatings (Cu, Ni, TiN) in controlled plasma environments. The oxidation process is performed in an oxygen plasma chamber in which both O+ and O2+ are created and accelerated toward the probes with energies < 10 eV. An argon plasma chamber is used to compare the probe's I-V curves before and after the oxidation process. Our preliminary results indicate that iridium shows the least effect of oxidation on the probe measurements. The second objective of this study is to identify methods that can be used in orbit to clean the surface of Langmuir probes to minimize the effect of exposure to oxidizing compounds.
Wall Conditioning Characterization in NSTX-U
NASA Astrophysics Data System (ADS)
Caron, D.; Soukhanovskii, V.; Scotti, F.; Weller, M.
2016-10-01
Impurities in tokamak plasmas can lead to disruptive instabilities due to radiative energy loss which impede access to high-confinements mode. One source of impurities in NSTX-U are water molecules trapped in graphite plasma facing components (PFCs), which make up the walls and divertors. Hydrogen and oxygen impurities are released into the plasma due to plasma surface interactions. Extreme ultraviolet (EUV) and visible spectrometers are used in conjunction with a residual gas analyzer (RGA) to characterize the source and amount of released impurities. A high resolution visible spectrometer measured H/D Balmer- α intensity ratio on the inner wall, the upper and lower divertors, and provided a hydrogen time history for shot-to-shot trends. The RGA provided partial pressure trends of masses 2 (H2) , 16 (O2) , and 18 (H2O). Trends of O VIII and C VI spectral line intensities from the core plasma were obtained from the EUV spectrometer. The trends are correlated with wall conditioning, namely helium glow discharge cleaning and boronization. Using these trends, impurity content monitoring and recommendations for wall conditioning can be implemented. Work supported by DOE under Contracts DE-AC52-07NA27344 and DE-AC02-09CH11466.
RF H-minus ion source development in China spallation neutron source
NASA Astrophysics Data System (ADS)
Chen, W.; Ouyang, H.; Xiao, Y.; Liu, S.; Lü, Y.; Cao, X.; Huang, T.; Xue, K.
2017-08-01
China Spallation Neutron Source (CSNS) phase-I project currently uses a Penning surface plasma H- ion source, which has a life time of several weeks with occasional sparks between high voltage electrodes. To extend the life time of the ion source and prepare for the CSNS phase-II, we are trying to develop a RF negative hydrogen ion source with external antenna. The configuration of the source is similar to the DESY external antenna ion source and SNS ion source. However several changes are made to improve the stability and the life time. Firstly, Si3N4 ceramic with high thermal shock resistance, and high thermal conductivity is used for plasma chamber, which can endure an average power of 2000W. Secondly, the water-cooled antenna is brazed on the chamber to improve the energy efficiency. Thirdly, cesium is injected directly to the plasma chamber if necessary, to simplify the design of the converter and the extraction. Area of stainless steel exposed to plasma is minimized to reduce the sputtering and degassing. Instead Mo, Ta, and Pt coated materials are used to face the plasma, which makes the self-cleaning of the source possible.
The study of low temperature plasma of pulse discharge in relation to air cleaning units.
NASA Astrophysics Data System (ADS)
Ponizovskiy, A.; Gosteev, S.; Kuzhel, O.
2017-11-01
In paper it studied parameters of low-temperature plasma (LTP) used in systems for cleaning waste gas. LTP created by positive nanosecond corona discharges, generated by high voltage pulses with a rise time of 50 ns, duration up to 400 ns, an amplitude up to 90 kV and pulses repetition 50-1000 Hz. in coaxial electrode system with gap space 3-10 cm through which moving air with linear velocity v = 0.01 to 10 m/s.
Evaluation of Low-Pressure Cold Plasma for Disinfection of ISS Grown Produce and Metal Instruments
NASA Technical Reports Server (NTRS)
Hummerick, Mary E.; Hintze, Paul E.; Maloney, Philip R.; Spencer, Lashelle E.; Coutts, Janelle L.; Franco, Carolina
2016-01-01
Low pressure cold plasma, using breathing air as the plasma gas, has been shown to be effective at precision cleaning aerospace hardware at Kennedy Space Center.Both atmospheric and low pressure plasmas are relatively new technologies being investigated for disinfecting agricultural commodities and medical instruments.
NASA Astrophysics Data System (ADS)
Langan, John
1996-10-01
The predominance of multi-level metalization schemes in advanced integrated circuit manufacturing has greatly increased the importance of plasma enhanced chemical vapor deposition (PECVD) and in turn in-situ plasma chamber cleaning. In order to maintain the highest throughput for these processes the clean step must be as short as possible. In addition, there is an increasing desire to minimize the fluorinated gas usage during the clean, while maximizing its efficiency, not only to achieve lower costs, but also because many of the gases used in this process are global warming compounds. We have studied the fundamental properties of discharges of NF_3, CF_4, and C_2F6 under conditions relevant to chamber cleaning in the GEC rf reference cell. Using electrical impedance analysis and optical emission spectroscopy we have determined that the electronegative nature of these discharges defines the optimal processing conditions by controlling the power coupling efficiency and mechanisms of power dissipation in the discharge. Examples will be presented where strategies identified by these studies have been used to optimize actual manufacturing chamber clean processes. (This work was performed in collaboration with Mark Sobolewski, National Institute of Standards and Technology, and Brian Felker, Air Products and Chemicals, Inc.)
NASA Astrophysics Data System (ADS)
Figueiredo, N. M.; Serra, R.; Manninen, N. K.; Cavaleiro, A.
2018-05-01
Gold clusters were produced by plasma gas condensation method and studied in great detail for the first time. The influence of argon flow, discharge power applied to the Au target and aggregation chamber length on the size distribution and deposition rate of Au clusters was evaluated. Au clusters with sizes between 5 and 65 nm were deposited with varying deposition rates and size dispersion curves. Nanocomposite Au-TiO2 and Au-Al2O3 coatings were then deposited by alternating sputtering. These coatings were hydrophobic and showed strong colorations due to the surface plasmon resonance effect. By simulating the optical properties of the nanocomposites it was possible to identify each individual contribution to the overall surface plasmon resonance signal. These coatings show great potential to be used as high performance localized surface plasmon resonance sensors or as robust self-cleaning decorative protective layers. The hybrid method used for depositing the nanocomposites offers several advantages over co-sputtering or thermal evaporation processes, since a broader range of particle sizes can be obtained (up to tens of nanometers) without the application of any thermal annealing treatments and the properties of clusters and matrix can be controlled separately.
The effect of copper substrate’s roughness on graphene growth process via PECVD
NASA Astrophysics Data System (ADS)
Fan, Tengfei; Yan, Cuixia; Lu, Jianchen; Zhang, Lianchang; Cai, Jinming
2018-04-01
Despite many excellent properties, the synthesis of high quality graphene with low-cost way is still a challenge, thus many different factors have been researched. In this work, the effect of surface roughness to the graphene quality was studied. Graphene was synthesized by plasma enhanced chemical vapor deposition (PECVD) method on copper substrates with different roughness from 0.074 μm to 0.339 μm, which were prepared via annealing, corrosion or polishing, respectively. Ar+ plasma cleaning was applied before graphene growth in order to accommodate similar surface chemical reactivity to each other. Scanning electron microscope and Raman spectroscope were employed to investigate the effect of surface roughness, which reveals that the graphene quality decrease first and then increase again according to the ratio of ID/IG in Raman spectroscopy. When the ratio of ID/IG reaches the largest number, the substrate roughness is 0.127 μm, where is the graphene quality changing point. First principle calculation was applied to explain the phenomenon and revealed that it is strongly affected by the graphene grain size and quantity which can induce defects. This strategy is expected to guide the industrial production of graphene.
NASA Astrophysics Data System (ADS)
Tessarolo, Francesco; Ferrari, Paolo; Silvia, Bortoluzzi; Motta, Antonella; Migliaresi, Claudio; Zennaro, Lucio; Rigo, Adelio; Guarrera, Giovanni Maria; Nollo, Giandomenico
2004-11-01
The increasing demand in interventional cardiology urges for reprocessing of single-use-labelled medical devices. To fulfil this aim, accurate and validated regeneration protocols are mandatory to guarantee sterility, functionality and safeness. The reprocessing protocol was realized by decontamination with chloro-donors, cleaning with enzymatic solutions and hydrogen peroxide gas plasma sterilization. Reprocessing effects on ablation and electrophysiology catheters were evaluated by assessing physical-chemical changes on surfaces and bulks, as a function of the reprocessing cycles number. Conventional optical microscopy and environmental scanning electron microscopy (ESEM) underlined the presence of micro-scratches on the polyurethane shaft surface. A clear correlation was found between surface damages and number of reprocessing cycles. Atomic force microscopy (AFM) confirmed the occurrence of physical-chemical etching of the polyurethane shaft caused by the hydrogen peroxide plasma sterilization, with increasing of nano-roughness at increasing number of the reprocessing cycles. UV-Vis spectra performed on the incubation solution of polymeric shaft sample, showed an absorbance increase at about 208 nm. This fact could be attributed to the water elution from the polymer of low molecular weight oligomers. The presence of hydrolysis products of the polymeric shaft after incubation demands both the characterization of the products released in the solution and the chemical characterization of the water exposed surface.
Cleaning with Bulk Nanobubbles.
Zhu, Jie; An, Hongjie; Alheshibri, Muidh; Liu, Lvdan; Terpstra, Paul M J; Liu, Guangming; Craig, Vincent S J
2016-11-01
The electrolysis of aqueous solutions produces solutions that are supersaturated in oxygen and hydrogen gas. This results in the formation of gas bubbles, including nanobubbles ∼100 nm in size that are stable for ∼24 h. These aqueous solutions containing bubbles have been evaluated for cleaning efficacy in the removal of model contaminants bovine serum albumin and lysozyme from surfaces and in the prevention of the fouling of surfaces by these same proteins. Hydrophilic and hydrophobic surfaces were investigated. It is shown that nanobubbles can prevent the fouling of surfaces and that they can also clean already fouled surfaces. It is also argued that in practical applications where cleaning is carried out rapidly using a high degree of mechanical agitation the role of cleaning agents is not primarily in assisting the removal of soil but in suspending the soil that is removed by mechanical action and preventing it from redepositing onto surfaces. This may also be the primary mode of action of nanobubbles during cleaning.
The paper describes computer software, called SAGE, that can provide not only cleaning recommendations but also general information on various surface cleaning options. In short, it is an advisory system which can provide users with vital information on the cleaning process optio...
Cleaning Processes across NASA Centers
NASA Technical Reports Server (NTRS)
Hammond, John M.
2010-01-01
All significant surfaces of the hardware must be pre-cleaned to remove dirt, grit, scale, corrosion, grease, oil and other foreign matter prior to any final precision cleaning process. Metallic parts shall be surface treated (cleaned, passivated, pickled and/or coated) as necessary to prevent latent corrosion and contamination.
NASA Astrophysics Data System (ADS)
Zhang, Lujie; Yu, Shuang; Wang, Kaile; Zhang, Jue; Fang, Jing
2017-11-01
In this study, using an atmospheric pressure air plasma jet generated by a dielectric barrier structure with hollow electrodes (HEDBS), we developed an ultrafast process for spraying TiO2 self-cleaning films inside tubular substrates. Importantly, SEM images showed that the TiO2 particles were dispersed evenly in the tubular substrates. Furthermore, Raman and XRD pattern indicated the anatase structure of the HEDBS-spayed TiO2 coating after heating at 270 °C. Further results of the self cleaning test suggested that the proposed cost- and time-saving HEDBS approach with air working gas could provide a feasible way for synthesizing thin TiO2 nanofilms.
Effectiveness of Surface Cleaning and Disinfection in a Brazilian Healthcare Facility
Santos-Junior, Aires G.; Ferreira, Adriano M.; Frota, Oleci P.; Rigotti, Marcelo A.; Barcelos, Larissa da S.; Lopes de Sousa, Alvaro Francisco; de Andrade, Denise; Guerra, Odanir G.; R. Furlan, Mara C.
2018-01-01
Background: Failures in the processes of cleaning and disinfecting health service surfaces may result in the spread and transfer of pathogens that are often associated with healthcare-related infections and outbreaks. Aims: To assess the effectiveness of environmental surface cleaning and disinfection in a hospital clinic. Method: The study was conducted in a nursing ward with 45 beds. A total of 80 samples from five high-touch surfaces were evaluated before and after cleaning and disinfection, using the following methods: visual inspection, adenosine triphosphate bioluminescence assay, aerobic colony count, Staphylococcus aureus colony count, and evaluation of resistance to methicillin. The data analysis used nonparametric comparative and correlative tests to observe any differences in the pre- and post- cleaning and disinfection results for the surfaces assessed. Results: Effective cleaning and disinfection had a significant effect on only two surfaces when measured for the presence of adenosine triphosphate, the inner bathroom door handle (p=0.007) and the toilet bowl (p=0.01). When evaluated for Staphylococcus aureus colony count, the toilet flush handle also demonstrated a significant effect (p=0.04). Conclusion: The effectiveness of cleaning and disinfection of the surfaces tested was not satisfactory. An educational intervention is recommended for the cleaning and disinfection staff and the nursing team at the healthcare facility. Relevance to Clinical Practice: The data in the study revealed that daily hospital cleaning and disinfection in the sampled sites are not sufficient in medical and surgical wards. Hospital cleanliness must be reevaluated from the point of view of materials, such as an adequate supply of clean cloths, in addition to establishing more precise cleanliness protocols and accurate monitoring systems. PMID:29643951
Goodman, Eric R.; Platt, Richard; Bass, Richard; Onderdonk, Andrew B.; Yokoe, Deborah S.; Huang, Susan S.
2009-01-01
OBJECTIVES To evaluate the adequacy of discharge room cleaning and the impact of a cleaning intervention on the presence of methicillin-resistant Staphylococcus aureus (MRSA) and vancomycin-resistant enterococci (VRE) on environmental surfaces in intensive care unit (ICU) rooms. DESIGN Prospective environmental study. SETTING AND SAMPLE Convenience sample of ICU rooms in an academic hospital. METHODS AND INTERVENTION The intervention consisted of (1) a change from the use of pour bottles to bucket immersion for applying disinfectant to cleaning cloths, (2) an educational campaign, and (3) feedback regarding adequacy of discharge cleaning. Cleaning of 15 surfaces was evaluated by inspecting for removal of a preapplied mark, visible only with an ultraviolet lamp (“black light”). Six surfaces were cultured for MRSA or VRE contamination. Outcomes of mark removal and culture positivity were evaluated by χ2 testing and generalized linear mixed models, clustering by room. RESULTS The black-light mark was removed from 44% of surfaces at baseline, compared with 71% during the intervention (P <.001). The intervention increased the likelihood of removal of black-light marks after discharge cleaning (odds ratio, 4.4; P < .001), controlling for ICU type (medical vs surgical) and type of surface. The intervention reduced the likelihood of an environmental culture positive for MRSA or VRE (proportion of cultures positive, 45% at baseline vs 27% during the intervention; adjusted odds ratio, 0.4; P = .02). Broad, flat surfaces were more likely to be cleaned than were doorknobs and sink or toilet handles. CONCLUSIONS Increasing the volume of disinfectant applied to environmental surfaces, providing education for Environmental Services staff, and instituting feedback with a black-light marker improved cleaning and reduced the frequency of MRSA and VRE contamination. PMID:18624666
Comparative study of pulsed laser cleaning applied to weathered marble surfaces
NASA Astrophysics Data System (ADS)
Ortiz, P.; Antúnez, V.; Ortiz, R.; Martín, J. M.; Gómez, M. A.; Hortal, A. R.; Martínez-Haya, B.
2013-10-01
The removal of unwanted matter from surface stones is a demanding task in the conservation of cultural heritage. This paper investigates the effectiveness of near-infrared (IR) and ultraviolet (UV) laser pulses for the cleaning of surface deposits, iron oxide stains and different types of graffiti (black, red and green sprays and markers, and black cutting-edge ink) on dolomitic white marble. The performance of the laser techniques is compared to common cleaning methods on the same samples, namely pressurized water and chemical treatments. The degree of cleaning achieved with each technique is assessed by means of colorimetric measurements and X-ray microfluorescence. Eventual morphological changes induced on the marble substrate are monitored with optical and electronic microscopy. It is found that UV pulsed laser ablation at 266 nm manages to clean all the stains except the cutting-edge ink, although some degree of surface erosion is produced. The IR laser pulses at 1064 nm can remove surface deposits and black spray acceptably, but a yellowing is observed on the stone surface after treatment. An economic evaluation shows that pulsed laser cleaning techniques are advantageous for the rapid cleaning of small or inaccessible surface areas, although their extensive application becomes expensive due to the long operating times required.
A comparison of the effects of toothbrushing and handpiece prophylaxis on retention of sealants.
Kolavic Gray, Shellie; Griffin, Susan O; Malvitz, Dolores M; Gooch, Barbara F
2009-01-01
Tooth surface cleaning before acid etching is considered to be an important step in the retention of resin-based pit-and-fissure sealants. The authors reviewed and summarized instructions for cleaning tooth surfaces from five manufacturers of 10 unfilled resin-based sealants marketed in the United States. The authors also searched electronic databases for studies that directly compared the effects of different surface-cleaning methods on sealant retention and for systematic reviews of the effectiveness of sealants. They explored the association between surface-cleaning methods and sealant retention in the studies included in the systematic reviews. They calculated the summary weighted retention rates for studies that used either a handpiece or toothbrush prophylaxis. All of the sealant manufacturers' instructions for use (IFU) recommended cleaning the tooth before acid etching. None of the IFU directly stated that a handpiece was required to perform the cleaning, but five IFU implied the use of handpiece prophylaxis. None of the IFU recommended surface-altering procedures in caries-free teeth. Direct evidence from two clinical trials showed no difference in complete sealant retention between surfaces cleaned mechanically with pumice or prophylaxis paste and those cleaned with air-water syringe or dry toothbrushing. Indirect evidence from 10 studies found that weighted summary retention by year after sealant placement in studies that used toothbrush prophylaxis was greater than or equivalent to values for studies that used handpiece prophylaxis. Levels of sealant retention after surface cleaning with toothbrush prophylaxis were at least as high as those associated with hand-piece prophylaxis. This finding may translate into lower resource costs for sealant placement.
Method and apparatus for reducing cleaning blade wear
Grannes, Steven G.; Rhoades, Charles A.; Hebbie, Terry L.
1992-01-01
An improved cleaning blade construction (10) for eliminating erosion troughs (6) in the upper surface (15) of a cleaning blade member (14) by introducing pressurized fluid through a pressure manifold chamber (16) formed in the upper surface (15) of the cleaning blade member (14). The pressurized fluid will prevent carryback material (7) from passing through a wear groove (6) formed in the cleaning blade member.
NASA Technical Reports Server (NTRS)
Davis, G. D.; Groff, G. B.; Rooney, M.; Cooke, A. V.; Boothe, R.
1995-01-01
Plasma-sprayed Bondable Stainless Surface (BOSS) coatings are being developed under the Solid Propulsion Integrity Program's (SPIP) Bondlines Package. These coatings are designed as a steel case preparation treatment prior to insulation lay-up. Other uses include the exterior of steel cases and bonding surfaces of nozzle components. They provide excellent bondability - rubber insulation and epoxy bonds fail cohesively within the polymer - for both fresh surfaces and surfaces having undergone natural and accelerated environmental aging. They have passed the MSFC requirements for protection of inland and sea coast environment. Because BOSS coatings are inherently corrosion resistant, they do not require preservation by greases or oils. The reduction/elimination of greases and oils, known bondline degraders, can increase SRM reliability, decrease costs by reducing the number of process steps, and decrease environmental pollution by reducing the amount of methyl chloroform used for degreasing and thus reduce release of the ozone-depleting chemical in accordance with the Clean Air Act and the Montreal Protocol. The coatings can potential extend the life of RSRM case segments and nozzle components by eliminating erosion due to multiple grit blasting during each use cycle and corrosion damage during marine recovery. Concurrent work for the Air Force show that other BOSS coatings give excellent bondline strength and durability for high-performance structures of aluminum and titanium.
Xu, Pengyun; Coyle, Thomas W; Pershin, Larry; Mostaghimi, Javad
2018-08-01
Superhydrophobic surfaces are often created by fabricating suitable surface structures from low-surface-energy organic materials using processes that are not suitable for large-scale fabrication. Rare earth oxides (REO) exhibit hydrophobic behavior that is unusual among oxides. Solution precursor plasma spray (SPPS) deposition is a rapid, one-step process that can produce ceramic coatings with fine scale columnar structures. Manipulation of the structure of REO coatings through variation in deposition conditions may allow the wetting behavior to be controlled. Yb 2 O 3 coatings were fabricated via SPPS. Coating structure was investigated by scanning electron microscopy, digital optical microscopy, and x-ray diffraction. The static water contact angle and roll-off angle were measured, and the dynamic impact of water droplets on the coating surface recorded. Superhydrophobic behavior was observed; the best coating exhibited a water contact angle of ∼163°, a roll-off angle of ∼6°, and complete droplet rebound behavior. All coatings were crystalline Yb 2 O 3 , with a nano-scale roughness superimposed on a micron-scale columnar structure. The wetting behaviors of coatings deposited at different standoff distances were correlated with the coating microstructures and surface topographies. The self-cleaning, water flushing and water jetting tests were conducted and further demonstrated the excellent and durable hydrophobicity of the coatings. Copyright © 2018 Elsevier Inc. All rights reserved.
Haidar Ahmad, Imad A; Blasko, Andrei
2017-08-11
The aim of this work is to identify the parameters that affect the recovery of pharmaceutical residues from the surface of stainless steel coupons. A series of factors were assessed, including drug product spike levels, spiking procedure, drug-excipient ratios, analyst-to-analyst variability, intraday variability, and cleaning procedure of the coupons. The lack of a well-defined procedure that consistently cleaned the coupon surface was identified as the major contributor to low and variable recoveries. Assessment of cleaning the surface of the coupons with clean-in-place solutions (CIP) gave high recovery (>90%) and reproducible results (Srel≤4%) regardless of the conditions that were assessed previously. The approach was successfully applied for cleaning verification of small molecules (MW <1,000 Da) as well as large biomolecules (MW up to 50,000 Da).
NASA Astrophysics Data System (ADS)
Soultati, Anastasia; Kostis, Ioannis; Papadimitropoulos, Giorgos; Zeniou, Angelos; Gogolides, Evangelos; Alexandropoulos, Dimitris; Vainos, Nikos; Davazoglou, Dimitris; Speliotis, Thanassis; Stathopoulos, Nikolaos A.; Argitis, Panagiotis; Vasilopoulou, Maria
2017-12-01
Pre-treatment methods are commonly employed to clean as well as to modify electrode surfaces. Many previous reports suggest that modifying the surface properties of indium tin oxide (ITO) by oxygen plasma treatment is a crucial step for the fabrication of high performance organic solar cells. In this work, we propose a fast and cost-effective microwave exposure step for the modification of the surface properties of ITO anode electrodes used in organic solar cells. It is demonstrated that a short microwave exposure improves the hydrophilicity and reduces the roughness of the ITO surface, as revealed by contact angle and atomic force microscopy (AFM) measurements, respectively, leading to a better quality of the PEDOT:PSS film coated on top of it. Similar results were obtained with the commonly used oxygen plasma treatment of ITO suggesting that microwave exposure is an effective process for modifying the surface properties of ITO with the benefits of low-cost, easy and fast processing. In addition, the influence of the microwave exposure of ITO anode electrode on the performance of an organic solar cell based on the poly(3-hexylthiophene):[6,6]-phenyl C70 butyric acid methyl ester (P3HT:PC70BM) blend is investigated. The 71% efficiency enhancement obtained in the microwave annealed-ITO based device as compared to the device with the as-received ITO was mainly attributed to the improvement in the short circuit current (J sc) and decreased leakage current caused by the reduced series and the increased shunt resistances and also by the higher charge generation efficiency, and the reduced recombination losses.
Corrosion behaviour of laser-cleaned AA7024 aluminium alloy
NASA Astrophysics Data System (ADS)
Zhang, F. D.; Liu, H.; Suebka, C.; Liu, Y. X.; Liu, Z.; Guo, W.; Cheng, Y. M.; Zhang, S. L.; Li, L.
2018-03-01
Laser cleaning has been considered as a promising technique for the preparation of aluminium alloy surfaces prior to joining and welding and has been practically used in the automotive industry. The process is based on laser ablation to remove surface contaminations and aluminium oxides. However the change of surface chemistry and oxide status may affect corrosion behaviour of aluminium alloys. Until now, no work has been reported on the corrosion characteristics of laser cleaned metallic surfaces. In this study, we investigated the corrosion behaviour of laser-cleaned AA7024-T4 aluminium alloy using potentiodynamic polarisation, electrochemical impedance spectroscopy (EIS) and scanning vibrating electrode technique (SVET). The results showed that the laser-cleaned surface exhibited higher corrosion resistance in 3.5 wt.% NaCl solution than as-received hot-rolled alloy, with significant increase in impedance and decrease in capacitance, while SVET revealed that the active anodic points appeared on the as-received surface were not presented on the laser-cleaned surfaces. Such corrosion behaviours were correlated to the change of surface oxide status measured by glow discharge optical emission spectrometry (GDOES) and X-ray photoelectron spectroscopy (XPS). It was suggested that the removal of the original less protective oxide layer consisting of MgO and MgAl2O4 on the as-received surfaces and the newly formed more protective oxide layer containing mainly Al2O3 and MgO by laser cleaning were responsible for the improvement of the corrosion performance.
Particulate Removal Using a CO2 Composite Spray Cleaning System
NASA Technical Reports Server (NTRS)
Chen, Nicole; Lin, Ying; Jackson, David; Chung, Shirley
2016-01-01
The Planetary Protection surface cleanliness requirements for potential Mars Sample Return hardware that would come in contact with Martian samples may be stricter than previous missions. The Jet Propulsion Laboratory has developed a new technology that will enable us to remove sub-micron size particles from critical hardware surfaces. A hand-held CO2 composite cleaning system was tested to verify its cleaning capabilities. This convenient, portable device can be used in cleanrooms for cleaning after rework or during spacecraft integration and assembly. It is environmentally safe and easy to use. This cleaning concept has the potential to be further developed into a robotic cleaning device on a Mars Lander to be used to clean sample acquisition or sample handling devices in situ. Contaminants of known sizes and concentrations, such as fluorescent microspheres and spores were deposited on common spacecraft material surfaces. The cleaning efficiency results will be presented and discussed.
Cavitation effects in ultrasonic cleaning baths
NASA Technical Reports Server (NTRS)
Glasscock, Barbara H.
1995-01-01
In this project, the effect of cavitation from aqueous ultrasonic cleaning on the surfaces of metal and non-metal sample coupons was studied. After twenty cleaning cycles, the mass loss from the aluminum coupons averaged 0.22 mg/sq cm surface area and 0.014 mg/sq cm for both stainless steel and titanium. The aluminum coupons showed visual evidence of minor cavitation erosion in regions of previously existing surface irregularities. The non-metal samples showed some periods of mass gain. These effects are believed to have minor impact on hardware being cleaned, but should be evaluated in the context of specific hardware requirements. Also the ultrasonic activity in the large cleaning baths was found to be unevenly distributed as measured by damage to sheets of aluminum foil. It is therefore recommended that items being cleaned in an ultrasonic bath be moved or conveyed during the cleaning to more evenly distribute the cavitation action provide more uniform cleaning.
Adaptable bioinspired special wetting surface for multifunctional oil/water separation
NASA Astrophysics Data System (ADS)
Kavalenka, Maryna N.; Vüllers, Felix; Kumberg, Jana; Zeiger, Claudia; Trouillet, Vanessa; Stein, Sebastian; Ava, Tanzila T.; Li, Chunyan; Worgull, Matthias; Hölscher, Hendrik
2017-01-01
Inspired by the multifunctionality of biological surfaces necessary for the survival of an organism in its specific environment, we developed an artificial special wetting nanofur surface which can be adapted to perform different functionalities necessary to efficiently separate oil and water for cleaning accidental oil spills or separating industrial oily wastewater. Initial superhydrophobic nanofur surface is fabricated using a hot pulling method, in which nano- and microhairs are drawn out of the polymer surface during separation from a heated sandblasted steel plate. By using a set of simple modification techniques, which include microperforation, plasma treatment and subsequent control of storage environment, we achieved selective separation of either water or oil, variable oil absorption and continuous gravity driven separation of oil/water mixtures by filtration. Furthermore, these functions can be performed using special wetting nanofur made from various thermoplastics, including biodegradable and recyclable polymers. Additionally, nanofur can be reused after washing it with organic solvents, thus, further helping to reduce the environmental impacts of oil/water separation processes.
Adaptable bioinspired special wetting surface for multifunctional oil/water separation
Kavalenka, Maryna N.; Vüllers, Felix; Kumberg, Jana; Zeiger, Claudia; Trouillet, Vanessa; Stein, Sebastian; Ava, Tanzila T.; Li, Chunyan; Worgull, Matthias; Hölscher, Hendrik
2017-01-01
Inspired by the multifunctionality of biological surfaces necessary for the survival of an organism in its specific environment, we developed an artificial special wetting nanofur surface which can be adapted to perform different functionalities necessary to efficiently separate oil and water for cleaning accidental oil spills or separating industrial oily wastewater. Initial superhydrophobic nanofur surface is fabricated using a hot pulling method, in which nano- and microhairs are drawn out of the polymer surface during separation from a heated sandblasted steel plate. By using a set of simple modification techniques, which include microperforation, plasma treatment and subsequent control of storage environment, we achieved selective separation of either water or oil, variable oil absorption and continuous gravity driven separation of oil/water mixtures by filtration. Furthermore, these functions can be performed using special wetting nanofur made from various thermoplastics, including biodegradable and recyclable polymers. Additionally, nanofur can be reused after washing it with organic solvents, thus, further helping to reduce the environmental impacts of oil/water separation processes. PMID:28051163
NASA Astrophysics Data System (ADS)
Tsai, Jui-Hsuan; Cheng, I.-Chun; Hsu, Cheng-Che; Chen, Jian-Zhang
2018-01-01
Nitrogen DC-pulse atmospheric-pressure plasma jet (APPJ) and nitrogen dielectric barrier discharge (DBD) were applied to pre-treat fluorine-doped tin oxide (FTO) glass substrates for perovskite solar cells (PSCs). Nitrogen DC-pulse APPJ treatment (substrate temperature: ~400 °C) for 10 s can effectively increase the wettability, whereas nitrogen DBD treatment (maximum substrate temperature: ~140 °C) achieved limited improvement in wettability even with increased treatment time of 60 s. XPS results indicate that 10 s APPJ, 60 s DBD, and 15 min UV-ozone treatment of FTO glass substrates can decontaminate the surface. A PSC fabricated on APPJ-treated FTO showed the highest power conversion efficiency (PCE) of 14.90%; by contrast, a PSC with nitrogen DBD-treated FTO shows slightly lower PCE of 12.57% which was comparable to that of a PSC on FTO treated by a 15 min UV-ozone process. Both nitrogen DC-pulse APPJ and nitrogen DBD can decontaminate FTO substrates and can be applied for the substrate cleaning step of PSC.
Code of Federal Regulations, 2013 CFR
2013-07-01
... the aluminum recreational boat surface coating spray gun cleaning work practice standards? 63.5755... recreational boat surface coating spray gun cleaning work practice standards? You must demonstrate compliance with the aluminum coating spray gun cleaning work practice standards by meeting the requirements of...
Code of Federal Regulations, 2012 CFR
2012-07-01
... the aluminum recreational boat surface coating spray gun cleaning work practice standards? 63.5755... recreational boat surface coating spray gun cleaning work practice standards? You must demonstrate compliance with the aluminum coating spray gun cleaning work practice standards by meeting the requirements of...
Code of Federal Regulations, 2014 CFR
2014-07-01
... the aluminum recreational boat surface coating spray gun cleaning work practice standards? 63.5755... recreational boat surface coating spray gun cleaning work practice standards? You must demonstrate compliance with the aluminum coating spray gun cleaning work practice standards by meeting the requirements of...
Code of Federal Regulations, 2011 CFR
2011-07-01
... the aluminum recreational boat surface coating spray gun cleaning work practice standards? 63.5755... surface coating spray gun cleaning work practice standards? You must demonstrate compliance with the aluminum coating spray gun cleaning work practice standards by meeting the requirements of paragraph (a) or...
Code of Federal Regulations, 2010 CFR
2010-07-01
... the aluminum recreational boat surface coating spray gun cleaning work practice standards? 63.5755... surface coating spray gun cleaning work practice standards? You must demonstrate compliance with the aluminum coating spray gun cleaning work practice standards by meeting the requirements of paragraph (a) or...
NASA Astrophysics Data System (ADS)
Bixler, Gregory D.; Bhushan, Bharat
2013-08-01
Researchers are continually inspired by living nature to solve complex challenges. For example, unique surface characteristics of rice leaves and butterfly wings combine the shark skin (anisotropic flow leading to low drag) and lotus leaf (superhydrophobic and self-cleaning) effects, producing the so-called rice and butterfly wing effect. In this paper, we present an overview of rice leaf and butterfly wing fluid drag and self-cleaning studies. In addition, we examine two other promising aquatic surfaces in nature known for such properties, including fish scales and shark skin. Morphology, drag, self-cleaning, contact angle, and contact angle hysteresis data are presented to understand the role of wettability, viscosity, and velocity. Liquid repellent coatings are utilized to recreate or combine various effects. Discussion is provided along with conceptual models describing the role of surface structures related to low drag, self-cleaning, and antifouling properties. Modeling provides design guidance when developing novel low drag and self-cleaning surfaces for applications in the medical, marine, and industrial fields.
Edmunds, L M; Rawlinson, A
1998-10-01
Blood contamination of 16 surfaces in the dental surgery was investigated using the Kastle-Meyer test for haemoglobin, after three types of periodontal procedures had been performed on a total of 30 patients. The effect of cleaning surfaces contaminated by blood was investigated using the same test. Cleaning materials used in the dental surgery were tested to rule out the possibility of false positive outcomes and the sensitivity of the test was determined prior to the study. The results show a marked variation in the degree of contamination and efficacy of cleaning following treatment. Overall, root planing was associated with the most widespread and frequent blood contamination and gingival surgery the least. The surgery work surface, edge of the spittoon, aspirator tube and ultrasonic scaler handpiece into which the ultrasonic insert fits, were the most frequently contaminated surfaces. The work surface, dentist's pen, light switch and handle were cleaned most effectively. The least effectively cleaned surfaces were the water dispenser switch, aspirator tube, bracket table and ultrasonic scaler handpiece. Methods for reducing this potential source of cross-infection are discussed.
Lambrechts, A A; Human, I S; Doughari, J H; Lues, J F R
2014-09-01
Food borne illnesses and food poisoning are cause for concern globally. The diseases are often caused by food contamination with pathogenic bacteria due largely to poor sanitary habits or storage conditions. Prevalence of some bacteria on cleaned and sanitised food contact surfaces from eight convenience food plants in Gauteng (South Africa) was investigated with the view to evaluate the efficacy of the cleaning methods used with such food contact surfaces. The microbial load of eight convenience food manufacturing plants was determined by sampling stainless steel food contact surfaces after they had been cleaned and sanitised at the end of a day's shift. Samples were analysed for Total Plate Count (TPC), Escherichia coli, Salmonella species, Staphylococcus aureus and Listeria species. Results showed that 59 % of the total areas sampled for TPC failed to comply with the legal requirements for surfaces, according to the Foodstuffs, Cosmetics and Disinfectants Act (< 100 cfu.cm(-2)). S. aureus and Salmonella were not detected, but Listeria was detected in 23 % and E. coli in 1.3 % of the samples. Fifty percent (50 %) of the plants applied conventional cleaning methods for cleaning and sanitation and 50 % used the low-pressure foam (LPF) method. There was significant difference (P ≤ 0.05) between the mean TPC values of the conventional cleaning method (14 358.82) compared to that of LPF method (2 386.51) but no significant difference (P > 0.05) in terms of Listeria species isolates obtained from both cleaning methods. The LPF method proved to be the superior cleaning option for lowering TPC counts. Regardless of cleaning method used, pathogens continued to flourish on various surfaces, including dry stainless steel, posing a contamination hazard for a considerable period depending on the contamination level and type of pathogen. Intensive training for proper chemical usage and strict procedural compliance among workers for efficient cleaning procedures is recommended.
SnTe microcrystals: Surface cleaning of a topological crystalline insulator
DOE Office of Scientific and Technical Information (OSTI.GOV)
Saghir, M., E-mail: M.Saghir@warwick.ac.uk, E-mail: G.Balakrishnan@warwick.ac.uk; Walker, M.; McConville, C. F.
Investigating nanometer and micron sized materials thought to exhibit topological surface properties that can present a challenge, as clean surfaces are a pre-requisite for band structure measurements when using nano-ARPES or laser-ARPES in ultra-high vacuum. This issue is exacerbated when dealing with nanometer or micron sized materials, which have been prepared ex-situ and so have been exposed to atmosphere. We present the findings of an XPS study where various cleaning methods have been employed to reduce the surface contamination and preserve the surface quality for surface sensitive measurements. Microcrystals of the topological crystalline insulator SnTe were grown ex-situ and transferredmore » into ultra high vacuum (UHV) before being treated with either atomic hydrogen, argon sputtering, annealing, or a combination of treatments. The samples were also characterised using the scanning electron microscopy, both before and after treatment. It was found that atomic hydrogen cleaning with an anneal cycle (200 °C) gave the best clean surface results.« less
Self-cleaning of superhydrophobic surfaces by self-propelled jumping condensate
Wisdom, Katrina M.; Qu, Xiaopeng; Liu, Fangjie; Watson, Gregory S.; Chen, Chuan-Hua
2013-01-01
The self-cleaning function of superhydrophobic surfaces is conventionally attributed to the removal of contaminating particles by impacting or rolling water droplets, which implies the action of external forces such as gravity. Here, we demonstrate a unique self-cleaning mechanism whereby the contaminated superhydrophobic surface is exposed to condensing water vapor, and the contaminants are autonomously removed by the self-propelled jumping motion of the resulting liquid condensate, which partially covers or fully encloses the contaminating particles. The jumping motion off the superhydrophobic surface is powered by the surface energy released upon coalescence of the condensed water phase around the contaminants. The jumping-condensate mechanism is shown to spontaneously clean superhydrophobic cicada wings, where the contaminating particles cannot be removed by gravity, wing vibration, or wind flow. Our findings offer insights for the development of self-cleaning materials. PMID:23630277
Cleaning of copper traces on circuit boards with excimer laser radiation
NASA Astrophysics Data System (ADS)
Wesner, D. A.; Mertin, M.; Lupp, F.; Kreutz, E. W.
1996-04-01
Cleaning of Cu traces on circuit boards is studied using pulsed excimer laser radiation (pulse width ˜ 20 ns, wavelength 248 nm), with the goal of improving the properties of the Cu surface for soldering and bonding. Traces with well-defined oxide overlayers are cleaned by irradiation in air using ≤ 10 3 laser pulses at fluences per pulse of ≤ 2 J cm -2. After treatment the surface morphology is analyzed using optical microscopy, optical profilometry, and scanning electron microscopy, while the chemical state of the surface is investigated with X-ray photoelectron (XPS) spectroscopy. Ellipsometry is used to determine the oxide overlayer thickness. Prior to cleaning samples exhibit a contamination overlayer about 15-25 nm in thickness containing Cu 2O and C. Cleaning reduces the overlayer thickness to ≤ 10 nm by material removal. The process tends to be self-limiting, since the optical reflectivity of the oxidized Cu surface for laser radiation is smaller than that of the cleaned surface. Additionally, the interaction with the laser radiation results in surface segregation of a minor alloy component out of the bulk (e.g. Zn), which may help to passivate the surface for further chemical reactions.
Robust self-cleaning surfaces that function when exposed to either air or oil
NASA Astrophysics Data System (ADS)
Lu, Yao; Sathasivam, Sanjayan; Song, Jinlong; Crick, Colin R.; Carmalt, Claire J.; Parkin, Ivan P.
2015-03-01
Superhydrophobic self-cleaning surfaces are based on the surface micro/nanomorphologies; however, such surfaces are mechanically weak and stop functioning when exposed to oil. We have created an ethanolic suspension of perfluorosilane-coated titanium dioxide nanoparticles that forms a paint that can be sprayed, dipped, or extruded onto both hard and soft materials to create a self-cleaning surface that functions even upon emersion in oil. Commercial adhesives were used to bond the paint to various substrates and promote robustness. These surfaces maintained their water repellency after finger-wipe, knife-scratch, and even 40 abrasion cycles with sandpaper. The formulations developed can be used on clothes, paper, glass, and steel for a myriad of self-cleaning applications.
Shear stress cleaning for surface departiculation
NASA Technical Reports Server (NTRS)
Musselman, R. P.; Yarbrough, T. W.
1986-01-01
A cleaning technique widely used by the nuclear utility industry for removal of radioactive surface contamination has proven effective at removing non-hazardous contaminant particles as small as 0.1 micrometer. The process employs a controlled high velocity liquid spray inside a vapor containment enclosure to remove particles from a surface. The viscous drag force generated by the cleaning fluid applies a shear stress greater than the adhesion force that holds small particles to a substrate. Fluid mechanics and field tests indicate general cleaning parameters.
Air powder abrasive treatment as an implant surface cleaning method: a literature review.
Tastepe, Ceylin S; van Waas, Rien; Liu, Yuelian; Wismeijer, Daniel
2012-01-01
To evaluate the air powder abrasive treatment as an implant surface cleaning method for peri-implantitis based on the existing literature. A PubMed search was conducted to find articles that reported on air powder abrasive treatment as an implant surface cleaning method for peri-implantitis. The studies evaluated cleaning efficiency and surface change as a result of the method. Furthermore, cell response toward the air powder abrasive-treated discs, reosseointegration, and clinical outcome after treatment is also reported. The PubMed search resulted in 27 articles meeting the inclusion criteria. In vitro cleaning efficiency of the method is reported to be high. The method resulted in minor surface changes on titanium specimens. Although the air powder abrasive-treated specimens showed sufficient levels of cell attachment and cell viability, the cell response decreased compared with sterile discs. Considerable reosseointegration between 39% and 46% and improved clinical parameters were reported after treatment when applied in combination with surgical treatment. The results of the treatment are influenced by the powder type used, the application time, and whether powder was applied surgically or nonsurgically. The in vivo data on air powder abrasive treatment as an implant surface cleaning method is not sufficient to draw definitive conclusions. However, in vitro results allow the clinician to consider the method as a promising option for implant surface cleaning in peri-implantitis treatment.
Corrigan, Damion K; Cauchi, Michael; Piletsky, Sergey; Mccrossen, Sean
2009-01-01
Cleaning verification is the process by which pharmaceutical manufacturing equipment is determined as sufficiently clean to allow manufacture to continue. Surface-enhanced Raman spectroscopy (SERS) is a very sensitive spectroscopic technique capable of detection at levels appropriate for cleaning verification. In this paper, commercially available Klarite SERS substrates were employed in order to obtain the necessary enhancement of signal for the identification of chemical species at concentrations of 1 to 10 ng/cm2, which are relevant to cleaning verification. The SERS approach was combined with principal component analysis in the identification of drug compounds recovered from a contaminated steel surface.
Cleanliness audit of clinical surfaces and equipment: who cleans what?
Anderson, R E; Young, V; Stewart, M; Robertson, C; Dancer, S J
2011-07-01
Current guidelines recommend regular cleaning of clinical equipment. We monitored items on a surgical ward for predominant user, hand-touch frequency, cleaning responsibilities and measurement of organic soil. Equipment was assessed in triplicate against a cleanliness benchmark of 100 relative light units (RLU) using the Hygiena® ATP system. There were 44 items, of which 21 were cleaned by clinical support workers (CSWs), five by domestic staff; three by nurses, three by doctors, and 12 with no designated cleaning responsibility. Geometric mean RLUs ranged from 60 to 550/100 cm² for small items such as hand-gel containers, bed control, blood pressure cuff and clinical notes; with similar values of 80-540/100 cm² RLU for larger items such as electrocardiogram machine, defibrillator, trolleys and tables. Overall geometric mean was 249/100 cm² RLU for all surfaces, with 84% (37 of 44) items exceeding the 100RLU benchmark. Of 27 items cleaned by clinical staff, 24 (89%) failed the benchmark. Of 12 sites with no cleaning specification, 11 (92%) failed the benchmark. Three of seven 'clean' sites (<100/100 cm² RLU) were cleaned by domestic staff. Average log(10) RLU of surfaces cleaned by domestics were 64% lower compared with surfaces cleaned by CSWs (95% confidence interval: 35%, 80%; P=0.019). In conclusion, clinical equipment frequently demonstrates high levels of organic soil, whether or not items have assigned cleaning responsibility. These findings suggest that cleaning practices for clinical equipment may require review, along with education of staff with specific cleaning responsibilities. Copyright © 2011 The Healthcare Infection Society. Published by Elsevier Ltd. All rights reserved.
Hosford, Eve; Ong, Ana; Richesson, Douglas; Fraser, Susan; Kwak, Yoon; Miller, Sonia; Julius, Michael; McGann, Patrick; Lesho, Emil
2016-01-01
Objectives The most efficient approach to monitoring and improving cleaning outcomes remains unresolved. We sought to extend the findings of a previous study by determining whether cleaning thoroughness (dye removal) correlates with cleaning efficacy (absence of molecular or cultivable biomaterial) and whether one brief educational intervention improves cleaning outcomes. Design Before-after trial. Setting Newly built community hospital. Intervention 90 minute training refresher with surface-specific performance results. Methods Dye removal, measured by fluorescence, and biomaterial removal and acquisition, measured with culture and culture-independent PCR-based assays, were clandestinely assessed for eight consecutive months. At this midpoint, results were presented to the cleaning staff (intervention) and assessments continued for another eight consecutive months. Results 1273 surfaces were sampled before and after terminal room cleaning. In the short-term, dye removal increased from 40.3% to 50.0% (not significant). For the entire study period, dye removal also improved but not significantly. After the intervention, the number of rooms testing positive for specific pathogenic species by culturing decreased from 55.6% to 36.6% (not significant), and those testing positive by PCR fell from 80.6% to 53.7% (P = 0.016). For nonspecific biomaterial on surfaces: a) removal of cultivable Gram-negatives (GN) trended toward improvement (P = 0.056); b) removal of any cultivable growth was unchanged but acquisition (detection of biomaterial on post-cleaned surfaces that were contaminant-free before cleaning) worsened (P = 0.017); c) removal of PCR-based detection of bacterial DNA improved (P = 0.046), but acquisition worsened (P = 0.003); d) cleaning thoroughness and efficacy were not correlated. Conclusion At this facility, a minor intervention or minimally more aggressive cleaning may reduce pathogen-specific contamination, but not without unintended consequences. PMID:27196635
Clifford, Robert; Sparks, Michael; Hosford, Eve; Ong, Ana; Richesson, Douglas; Fraser, Susan; Kwak, Yoon; Miller, Sonia; Julius, Michael; McGann, Patrick; Lesho, Emil
2016-01-01
The most efficient approach to monitoring and improving cleaning outcomes remains unresolved. We sought to extend the findings of a previous study by determining whether cleaning thoroughness (dye removal) correlates with cleaning efficacy (absence of molecular or cultivable biomaterial) and whether one brief educational intervention improves cleaning outcomes. Before-after trial. Newly built community hospital. 90 minute training refresher with surface-specific performance results. Dye removal, measured by fluorescence, and biomaterial removal and acquisition, measured with culture and culture-independent PCR-based assays, were clandestinely assessed for eight consecutive months. At this midpoint, results were presented to the cleaning staff (intervention) and assessments continued for another eight consecutive months. 1273 surfaces were sampled before and after terminal room cleaning. In the short-term, dye removal increased from 40.3% to 50.0% (not significant). For the entire study period, dye removal also improved but not significantly. After the intervention, the number of rooms testing positive for specific pathogenic species by culturing decreased from 55.6% to 36.6% (not significant), and those testing positive by PCR fell from 80.6% to 53.7% (P = 0.016). For nonspecific biomaterial on surfaces: a) removal of cultivable Gram-negatives (GN) trended toward improvement (P = 0.056); b) removal of any cultivable growth was unchanged but acquisition (detection of biomaterial on post-cleaned surfaces that were contaminant-free before cleaning) worsened (P = 0.017); c) removal of PCR-based detection of bacterial DNA improved (P = 0.046), but acquisition worsened (P = 0.003); d) cleaning thoroughness and efficacy were not correlated. At this facility, a minor intervention or minimally more aggressive cleaning may reduce pathogen-specific contamination, but not without unintended consequences.
Marx, B; Marx, R; Reisgen, U; Wirtz, D
2015-04-01
CoCrMo alloys are contraindicated for allergy sufferers. For these patients, uncemented and cemented prostheses made of titanium alloy are indicated. Knee prostheses machined from that alloy, however, may have poor tribological behaviour, especially in relation to UHMWPE inlays. Therefore, for knee replacement cemented high-strength oxide ceramic prostheses are suitable for allergy sufferers and in cases of particle-induced aseptic loosening. For adhesion of bone cement, the ceramic surface, however, only exposes inefficient mechanical retention spots as compared with a textured metal surface. Undercuts generated by corundum blasting which in the short-term are highly efficient on a CoCrMo surface are not possible on a ceramic surface due to the brittleness of ceramics. Textures due to blasting may initiate cracks which will weaken the strength of a ceramic prosthesis. Due to the lack of textures mechanical retention is poor or even not existent. Micromotions are promoted and early aseptic loosening is predictable. Instead silicoating of the ceramic surface will allow specific adhesion and result in better hydrolytic stability of bonding thereby preventing early aseptic loosening. Silicoating, however, presupposes a clean and chemically active surface which can be achieved by atmospheric plasma or thermal surface treatment. In order to evaluate the effectiveness of silicoating the bond strengths of atmospheric plasma versus thermal surface treated and silicate layered ZPTA surfaces were compared with "as-fired" surfaces by utilising TiAlV probes (diameter 6 mm) for traction-adhesive strength tests. After preparing samples for traction-adhesive strength tests (sequence: ceramic substrate, silicate and silane, protective lacquer [PolyMA], bone cement, TiAlV probe) they were aged for up to 150 days at 37 °C in Ringer's solution. The bond strengths observed for all ageing intervals were well above 20 MPa and much higher and more hydrolytically stable for silicate layered compared with "as-fired" ZPTA samples. Silicoating may be effective for achieving high initial bond strength of bone cement on surfaces of oxide ceramics and also suitable to stabilise bond strength under hydrolytic conditions as present in the human body in the long-term. Activation by atmospheric plasma or thermal surface treatment seems to be effective for activation prior to silicoating. Due the proposed silicate layer migration, micromotions and debonding should be widely reduced or even eliminated. Georg Thieme Verlag KG Stuttgart · New York.
NASA Technical Reports Server (NTRS)
Miyoshi, Kazuhisa; Pohlchuck, Bobby; Whitle, Neville C.; Hector, Louis G., Jr.; Adams, Jim
1998-01-01
An investigation was conducted to examine the adhesion and surface chemistry of single-crystal aluminum in contact with single-crystal sapphire (alumina). Pull-off force (adhesion) measurements were conducted under loads of 0. I to I mN in a vacuum of 10(exp -1) to 10(exp -9) Pa (approx. 10(exp -10) to 10(exp -11) torr) at room temperature. An Auger electron spectroscopy analyzer incorporated directly into an adhesion-measuring vacuum system was primarily used to define the chemical nature of the surfaces before and after adhesion measurements. The surfaces were cleaned by argon ion sputtering. With a clean aluminum-clean -sapphire couple the mean value and standard deviation of pull-off forces required to separate the surfaces were 3015 and 298 micro-N, respectively. With a contaminated aluminum-clean sapphire couple these values were 231 and 241 micro-N. The presence of a contaminant film on the aluminum surface reduced adhesion by a factor of 13. Therefore, surfaces cleanliness, particularly aluminum cleanliness, played an important role in the adhesion of the aluminum-sapphire couples. Pressures on the order of 10(exp -8) to 10(exp -9) Pa (approx. 10(exp -10) to 10(exp -11) torr) maintained a clean aluminum surface for only a short time (less then 1 hr) but maintained a clean sapphire surface, once it was achieved, for a much longer time.
Submillimeter Spectroscopic Diagnostics in Semiconductor Processing Plasmas
NASA Astrophysics Data System (ADS)
Helal, Yaser H.; Neese, Christopher F.; De Lucia, Frank C.; Ewing, Paul R.; Stout, Phillip J.; Walker, Quentin; Armacost, Michael D.
2014-06-01
Submillimeter absorption spectroscopy was used to study semiconductor processing plasmas. Abundances and temperatures of molecules, radicals, and ions can be determined without altering any of the properties of the plasma. The behavior of these measurements provides useful applications in monitoring process steps. A summary of such applications will be presented, including etching and cleaning endpoint detection.
Glow discharge cleaning of vacuum switch tubes
DOE Office of Scientific and Technical Information (OSTI.GOV)
Hayashi, T.; Toya, H.
1991-10-01
This paper reports that glow discharge cleaning has ben advancing as a means of degassing vacuum chambers constructed for a large accelerator or for nuclear fusion research. To clean the whole surface of parts inside a vacuum switch tube (VST), a new technique is tried which generates glow discharge between the inner electrodes and copper grid surrounding it. Photographic observation reveals that the glow discharge spreads out and cleans the whole surface inside the VST. A breakdown test between the inner electrodes shows the effect of the cleaning with this technique. Higher breakdown voltage between the inner electrodes is attainedmore » by performing this glow discharge cleaning in argon rather than hydrogen gas. The difference of the cleaning effect seems to be attributed to that of the energy transfer from ion species to the absorbed molecules and microprotrusions on the surfaces.« less
Ion-Deposited Polished Coatings
NASA Technical Reports Server (NTRS)
Banks, B. A.
1986-01-01
Polished, dense, adherent coatings relatively free of imperfections. New process consists of using broad-beam ion source in evacuated chamber to ion-clean rotating surface that allows grazing incidence of ion beam. This sputter cleans off absorbed gases, organic contaminants, and oxides of mirror surface. In addition to cleaning, surface protrusions sputter-etched away. Process particularly adaptable to polishing of various substrates for optical or esthetic purposes.
Evaluation of Various Cleaning Methods to Remove Bacillus Spores from Spacecraft Hardware Materials
NASA Technical Reports Server (NTRS)
Venkateswaran, Kasthuri; Chung, Shirley; Allton, Judith; Kern, Roger
2004-01-01
A detailed study was made of the biological cleaning effectiveness, defined in terms of the ability to remove bacterial spores, of a number of methods used to clean hardware surfaces. Aluminum (Al 6061) and titanium (Ti 6Al-4V) were chosen for the study as they were deemed the two materials most likely to be used in spacecraft extraterrestrial sampler construction. None of the cleaning protocols tested completely removed viable spores from the surface of the aluminum. In contrast, titanium was capable of being cleaned to sterility by two methods, the JPL standard and the commercial SAMS cleaning process. Further investigation showed that the passivation step employed in the JPL standard method is an effective surface sterilant on both metals but not compatible with aluminum. It is recommended that titanium (Ti 6Al-4V) be considered superior to aluminum (Al 6061) for use in spacecraft sampling hardware, both for its potential to be cleaned to sterilization and for its ability to withstand the most effective cleaning protocols.
Removal of naturally grown human biofilm with an atmospheric pressure plasma jet: An in-vitro study.
Jablonowski, Lukasz; Fricke, Katja; Matthes, Rutger; Holtfreter, Birte; Schlüter, Rabea; von Woedtke, Thomas; Weltmann, Klaus-Dieter; Kocher, Thomas
2017-05-01
The removal of biofilm is a prerequisite for a successful treatment of biofilm-associated diseases. In this study, we compared the feasibility of an atmospheric pressure plasma device with a sonic powered brush to remove naturally grown supragingival biofilm from extracted teeth. Twenty-four periodontally hopeless teeth were extracted. Argon jet plasma with an oxygen admixture of 1 vol% and a sonically driven brush were used to remove biofilm with application times of 60 s, 180 s and 300 s. The treatment efficiency was assessed with light microscopy, scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). The highest biofilm removal rate was observed after an application time of 180 s/300 s with the sonic brush (80.4%/86.2%), plasma (75.5%/89.0%). These observations were confirmed by SEM. According to XPS analysis, plasma treatment decreased the amount of carbon and nitrogen, indicative of an extensive removal of proteins. Plasma treatment of naturally grown biofilm resulted in an effective cleaning of the tooth surface and was comparable to mechanical treatment. Treatment time had a significant influence on plaque reduction. These results showed that plasma could be a useful adjuvant treatment modality in cases where biofilm removal or reduction plays a decisive role, such as periodontitis and peri-implantitis. Plasma-treated biofilm on an extracted tooth. © 2017 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.
Code of Federal Regulations, 2012 CFR
2012-07-01
... NA NA NA NA NA NA NA NA NA NA Chamber Cleaning In situ plasma cleaning: 1-Ui NA NA NA NA NA NA 0.23... NA NA NA NA NA In Situ Thermal Cleaning: 1-Ui NA NA NA NA NA NA 0.28 NA NA NA NA BCF4 NA NA NA NA NA...
Gotoh, Keiko
2017-01-01
The detergency of products, mainly textiles, was evaluated using various experimental systems and discussed from the viewpoint of interfacial phenomena. The detergency phenomena observed for geometrically simple model systems were explained in terms of the total potential energy of interaction between the soil and the substrate, which was calculated as the sum of the electrical double layer, Lifshitzvan der Waals, and acid-base interactions using electrokinetic potentials and surface free energy components. Cleaning experiments using artificially soiled fabrics were performed using electro-osmotic flow and ultrasound as mechanical actions for soil removal, and the results were compared with those obtained with mechanical actions commonly used in textile washing. Simultaneous hydrophilization of the substrate and soil by an atmospheric pressure plasma jet remarkably improved the detergency in aqueous solutions. The application of the atmospheric pressure plasma jet to anti-fouling textiles was also proposed.
High contrast ion acceleration at intensities exceeding 10{sup 21} Wcm{sup −2}
DOE Office of Scientific and Technical Information (OSTI.GOV)
Dollar, F.; Zulick, C.; Matsuoka, T.
2013-05-15
Ion acceleration from short pulse laser interactions at intensities of 2×10{sup 21}Wcm{sup −2} was studied experimentally under a wide variety of parameters, including laser contrast, incidence angle, and target thickness. Trends in maximum proton energy were observed, as well as evidence of improvement in the acceleration gradients by using dual plasma mirrors over traditional pulse cleaning techniques. Extremely high efficiency acceleration gradients were produced, accelerating both the contaminant layer and high charge state ions from the bulk of the target. Two dimensional particle-in-cell simulations enabled the study of the influence of scale length on submicron targets, where hydrodynamic expansion affectsmore » the rear surface as well as the front. Experimental evidence of larger electric fields for sharp density plasmas is observed in simulation results as well for such targets, where target ions are accelerated without the need for contaminant removal.« less
DOE Office of Scientific and Technical Information (OSTI.GOV)
Maurya, Gulab Singh; Kumar, Rohit; Rai, Awadhesh Kumar, E-mail: awadheshkrai@rediffmail.com
2015-12-15
In the present manuscript, we demonstrate the design of an experimental setup for on-line laser induced breakdown spectroscopy (LIBS) analysis of impurity layers deposited on specimens of interest for fusion technology, namely, plasma-facing components (PFCs) of a tokamak. For investigation of impurities deposited on PFCs, LIBS spectra of a tokamak wall material like a stainless steel sample (SS304) have been recorded through contaminated and cleaned optical windows. To address the problem of identification of dust and gases present inside the tokamak, we have shown the capability of the apparatus to record LIBS spectra of gases. A new approach known asmore » “back collection method” to record LIBS spectra of impurities deposited on the inner surface of optical window is presented.« less
Experimental Study of Reciprocating Friction between Rape Stalk and Bionic Nonsmooth Surface Units
Ma, Zheng; Li, Yaoming; Xu, Lizhang
2015-01-01
Background. China is the largest producer of rape oilseed in the world; however, the mechanization level of rape harvest is relatively low, because rape materials easily adhere to the cleaning screens of combine harvesters, resulting in significant cleaning losses. Previous studies have shown that bionic nonsmooth surface cleaning screens restrain the adhesion of rape materials, but the underlying mechanisms remain unclear. Objective. The reciprocating friction between rape stalk and bionic nonsmooth metal surface was examined. Methods. The short-time Fourier transform method was used to discriminate the stable phase of friction signals and the stick-lag distance was defined to analyze the stable reciprocating friction in a phase diagram. Results. The reciprocating friction between rape stalk and metal surface is a typical stick-slip friction, and the bionic nonsmooth metal surfaces with concave or convex units reduced friction force with increasing reciprocating frequency. The results also showed that the stick-lag distance of convex surface increased with reciprocating frequency, which indicated that convex surface reduces friction force more efficiently. Conclusions. We suggest that bionic nonsmooth surface cleaning screens, especially with convex units, restrain the adhesion of rape materials more efficiently compared to the smooth surface cleaning screens. PMID:27034611
The construction, fouling and enzymatic cleaning of a textile dye surface.
Onaizi, Sagheer A; He, Lizhong; Middelberg, Anton P J
2010-11-01
The enzymatic cleaning of a rubisco protein stain bound onto Surface Plasmon Resonance (SPR) biosensor chips having a dye-bound upper layer is investigated. This novel method allowed, for the first time, a detailed kinetic study of rubisco cleanability (defined as fraction of adsorbed protein removed from a surface) from dyed surfaces (mimicking fabrics) at different enzyme concentrations. Analysis of kinetic data using an established mathematical model able to decouple enzyme transfer and reaction processes [Onaizi, He, Middelberg, Chem. Eng. Sci. 64 (2008) 3868] revealed a striking effect of dyeing on enzymatic cleaning performance. Specifically, the absolute rate constants for enzyme transfer to and from a dye-bound rubisco stain were significantly higher than reported previously for un-dyed surfaces. These increased transfer rates resulted in higher surface cleanability. Higher enzyme mobility (i.e., higher enzyme adsorption and desorption rates) at the liquid-dye interface was observed, consistent with previous suggestions that enzyme surface mobility is likely correlated with overall enzyme cleaning performance. Our results show that reaction engineering models of enzymatic action at surfaces may provide insight able to guide the design of better stain-resistant surfaces, and may also guide efforts to improve cleaning formulations. Copyright 2010 Elsevier Inc. All rights reserved.
Combined wet and dry cleaning of SiGe(001)
DOE Office of Scientific and Technical Information (OSTI.GOV)
Park, Sang Wook; Kaufman-Osborn, Tobin; Kim, Hyonwoong
Combined wet and dry cleaning via hydrofluoric acid (HF) and atomic hydrogen on Si{sub 0.6}Ge{sub 0.4}(001) surface was studied at the atomic level using ultrahigh vacuum scanning tunneling microscopy (STM), scanning tunneling spectroscopy (STS), and x-ray photoelectron spectroscopy to understand the chemical transformations of the surface. Aqueous HF removes native oxide, but residual carbon and oxygen are still observed on Si{sub 0.6}Ge{sub 0.4}(001) due to hydrocarbon contamination from post HF exposure to ambient. The oxygen contamination can be eliminated by shielding the sample from ambient via covering the sample in the HF cleaning solution until the sample is introduced tomore » the vacuum chamber or by transferring the sample in an inert environment; however, both processes still leave carbon contaminant. Dry in-situ atomic hydrogen cleaning above 330 °C removes the carbon contamination on the surface consistent with a thermally activated atomic hydrogen reaction with surface hydrocarbon. A postdeposition anneal at 550 °C induces formation of an atomically flat and ordered SiGe surface observed by STM. STS verifies that the wet and dry cleaned surface has an unpinned Fermi level with no states between the conduction and valence band edge comparable to sputter cleaned SiGe surfaces.« less
NASA Technical Reports Server (NTRS)
Hotaling, S. P.
1993-01-01
Two samples from Long Duration Exposure Facility (LDEF) experiment M0003-4 were analyzed for molecular and particulate contamination prior to and following treatment with advanced satellite contamination removal techniques (CO2 gas/solid jet spray and oxygen ion beam). The pre- and post-cleaning measurements and analyses are presented. The jet spray removed particulates in seconds. The low energy reactive oxygen ion beam removed 5,000 A of photo polymerized organic hydrocarbon contamination in less than 1 hour. Spectroscopic analytical techniques were applied to the analysis of cleaning efficiency including: Fourier transform infrared, Auger, x ray photoemissions, energy dispersive x ray, and ultraviolet/visible. The results of this work suggest that the contamination studied here was due to spacecraft self-contamination enhanced by atomic oxygen plasma dynamics and solar UV radiation. These results also suggest the efficacy for the jet spray and ion beam contamination control technologies for spacecraft optical surfaces.
Evidence for self-cleaning in gecko setae
NASA Astrophysics Data System (ADS)
Hansen, W. R.; Autumn, K.
2005-01-01
A tokay gecko can cling to virtually any surface and support its body mass with a single toe by using the millions of keratinous setae on its toe pads. Each seta branches into hundreds of 200-nm spatulae that make intimate contact with a variety of surface profiles. We showed previously that the combined surface area of billions of spatulae maximizes van der Waals interactions to generate large adhesive and shear forces. Geckos are not known to groom their feet yet retain their stickiness for months between molts. How geckos manage to keep their feet clean while walking about with sticky toes has remained a puzzle until now. Although self-cleaning by water droplets occurs in plant and animal surfaces, no adhesive has been shown to self-clean. In the present study, we demonstrate that gecko setae are a self-cleaning adhesive. Geckos with dirty feet recovered their ability to cling to vertical surfaces after only a few steps. Self-cleaning occurred in arrays of setae isolated from the gecko. Contact mechanical models suggest that self-cleaning occurs by an energetic disequilibrium between the adhesive forces attracting a dirt particle to the substrate and those attracting the same particle to one or more spatulae. We propose that the property of self-cleaning is intrinsic to the setal nanostructure and therefore should be replicable in synthetic adhesive materials in the future. adhesion | contact mechanics | locomotion | reptilia | nanotechnology
Surface Cleaning of Iron Artefacts by Lasers
NASA Astrophysics Data System (ADS)
Koh, Y. S.; Sárady, I.
In this paper the general method and ethics of the laser cleaning technique for conservation are presented. The results of two experiments are also presented; experiment 1 compares cleaning of rust by an Nd:YAG laser and micro-blasting whilst experiment 2 deals with removing the wax coating from iron samples by a TEA CO2 laser. The first experiment showed that cleaning with a pulsed laser and higher photon energy obtained a better surface structure than micro blasting. The second experiment showed how differences in energy density affect the same surface.
Removal of lead contaminated dusts from hard surfaces.
Lewis, Roger D; Condoor, Sridhar; Batek, Joe; Ong, Kee Hean; Backer, Denis; Sterling, David; Siria, Jeff; Chen, John J; Ashley, Peter
2006-01-15
Government guidelines have widely recommended trisodium phosphate (TSP) or "lead-specific" cleaning detergents for removal of lead-contaminated dust (LCD) from hard surfaces, such as floors and window areas. The purpose of this study was to determine if low-phosphate, non-lead-specific cleaners could be used to efficiently remove LCD from 3 types of surfaces (vinyl flooring, wood, and wallpaper). Laboratory methods were developed and validated for simulating the doping, embedding, and sponge cleaning of the 3 surface types with 4 categories of cleaners: lead-specific detergents, nonionic cleaners, anionic cleaners, and trisodium phosphate (TSP). Vinyl flooring and wood were worn using artificial means. Materials were ashed, followed by ultrasound extraction, and anodic stripping voltammetry (ASV). One-way analysis of variance approach was used to evaluate the surface and detergent effects. Surface type was found to be a significant factor in removal of lead (p < 0.001). Vinyl flooring cleaned better than wallpaper by over 14% and wood cleaned better than wallpaper by 13%. There was no difference between the cleaning action of vinyl flooring and wood. No evidence was found to support the use of TSP or lead-specific detergents over all-purpose cleaning detergents for removal of lead-contaminated dusts. No-phosphate, non-lead-specific detergents are effective in sponge cleaning of lead-contaminated hard surfaces and childhood lead prevention programs should consider recommending all-purpose household detergents for removal of lead-contaminated dust after appropriate vacuuming.
Overall behaviour of PFC integrated SST-1 vacuum system
NASA Astrophysics Data System (ADS)
Khan, Ziauddin; Raval, Dilip C.; Paravasu, Yuvakiran; Semwal, Pratibha; Dhanani, Kalpeshkumar R.; George, Siju; Shoaib, Mohammad; Prakash, Arun; Babu, Gattu R.; Thankey, Prashant; Pathan, Firozkhan S.; Pradhan, Subrata
2017-04-01
As a part of phase-I up-gradation of Steady-state Superconducting Tokamak (SST-1), Graphite Plasma Facing Components (PFCs) have been integrated inside SST-1 vacuum vessel as a first wall (FW) during Nov 14 and May 2015. The SST-1 FW has a total surface area of the installed PFCs exposed to plasma is ∼ 40 m2 which is nearly 50% of the total surface area of stainless steel vacuum chamber (∼75 m2). The volume of the vessel within the PFCs is ∼ 16 m3. After the integration of PFCs, the entire vessel as well as the PFC cooling/baking circuits has been qualified with an integrated helium leak tightness of < 1.0 x 10-8 mbar 1/s. The pumping system of the SST-1 vacuum vessel comprises of one number of Roots’ pump, four numbers of turbomolecular pumps and a cryopump. After the initial pump down, the PFCs were baked at 250 °C for nearly 20 hours employing hot nitrogen gas to remove the absorbed water vapours. Thereafter, Helium glow discharges cleaning were carried out towards the removal of surface impurities. The pump down characteristics of SST-1 vacuum chamber and the changes in the residual gaseous impurities after the installation of the PFCs will be discussed in this paper.
NASA Astrophysics Data System (ADS)
Haase, Fabian; Manova, Darina; Hirsch, Dietmar; Mändl, Stephan; Kersten, Holger
2018-04-01
A passive thermal probe has been used to detect dynamic changes in the secondary electron emission (SEE). Oxidized and nitrided materials have been studied during argon ion sputtering in a plasma immersion ion implantation process. Identical measurements have been performed for the metallic state with high voltage pulses accelerating nitrogen ions towards the surface, supposedly forming a nitride layer. Energy flux data were combined with scanning electron microscopy images of the surface to obtain information about the actual surface composition as well as trends and changes during the process. Within the measurements, a direct comparison of the SEE within both employed ion species (argon and nitrogen) is possible while an absolute quantification is still open. Additionally, the nominal composition of the investigated oxide and nitride layers does not always correspond to stoichiometric compounds. Nevertheless, the oxides showed a remarkably higher SEE compared to the pure metals, while an indistinct behavior was observed for the nitrides: some higher, some lower than the clean metal surfaces. For the aluminum alloy AlMg3 a complex time dependent evolution was observed with consecutive oxidation/sputtering cycles leading to a very rough surface with a diminished oxide layer, leading to an almost black surface of the metal and non-reproducible changes in the SEE. The presented method is a versatile technique for measuring dynamic changes of the surface for materials commonly used in PVD processes with a time resolution of about 1 min, e.g. magnetron sputtering or HiPIMS, where changes in the target or electrode composition are occurring but cannot be measured directly.
Stability of whole inactivated influenza virus vaccine during coating onto metal microneedles
Choi, Hyo-Jick; Bondy, Brian J.; Yoo, Dae-Goon; Compans, Richard W.; Kang, Sang-Moo; Prausnitz, Mark R.
2012-01-01
Immunization using a microneedle patch coated with vaccine offers the promise of simplified vaccination logistics and increased vaccine immunogenicity. This study examined the stability of influenza vaccine during the microneedle coating process, with a focus on the role of coating formulation excipients. Thick, uniform coatings were obtained using coating formulations containing a viscosity enhancer and surfactant, but these formulations retained little functional vaccine hemagglutinin (HA) activity after coating. Vaccine coating in a trehalose-only formulation retained about 40 – 50% of vaccine activity, which is a significant improvement. The partial viral activity loss observed in the trehalose-only formulation was hypothesized to come from osmotic pressure-induced vaccine destabilization. We found that inclusion of a viscosity enhancer, carboxymethyl cellulose, overcame this effect and retained full vaccine activity on both washed and plasma-cleaned titanium surfaces. The addition of polymeric surfactant, Lutrol® micro 68, to the trehalose formulation generated phase transformations of the vaccine coating, such as crystallization and phase separation, which was correlated to additional vaccine activity loss, especially when coating on hydrophilic, plasma-cleaned titanium. Again, the addition of a viscosity enhancer suppressed the surfactant-induced phase transformations during drying, which was confirmed by in vivo assessment of antibody response and survival rate after immunization in mice. We conclude that trehalose and a viscosity enhancer are beneficial coating excipients, but the inclusion of surfactant is detrimental to vaccine stability. PMID:23246470
Eckstein, Brittany C; Adams, Daniel A; Eckstein, Elizabeth C; Rao, Agam; Sethi, Ajay K; Yadavalli, Gopala K; Donskey, Curtis J
2007-01-01
Background Contaminated environmental surfaces may play an important role in transmission of some healthcare-associated pathogens. In this study, we assessed the adequacy of cleaning practices in rooms of patients with Clostridium difficile-associated diarrhea (CDAD) and vancomycin-resistant Enterococcus (VRE) colonization or infection and examined whether an intervention would result in improved decontamination of surfaces. Methods During a 6-week period, we cultured commonly touched surfaces (i.e. bedrails, telephones, call buttons, door knobs, toilet seats, and bedside tables) in rooms of patients with CDAD and VRE colonization or infection before and after housekeeping cleaning, and again after disinfection with 10% bleach performed by the research staff. After the housekeeping staff received education and feedback, additional cultures were collected before and after housekeeping cleaning during a 10-week follow-up period. Results Of the 17 rooms of patients with VRE colonization or infection, 16 (94%) had one or more positive environmental cultures before cleaning versus 12 (71%) after housekeeping cleaning (p = 0.125), whereas none had positive cultures after bleach disinfection by the research staff (p < 0.001). Of the 9 rooms of patients with CDAD, 100% had positive cultures prior to cleaning versus 7 (78%) after housekeeping cleaning (p = 0.50), whereas only 1 (11%) had positive cultures after bleach disinfection by research staff (p = 0.031). After an educational intervention, rates of environmental contamination after housekeeping cleaning were significantly reduced. Conclusion Our findings provide additional evidence that simple educational interventions directed at housekeeping staff can result in improved decontamination of environmental surfaces. Such interventions should include efforts to monitor cleaning and disinfection practices and provide feedback to the housekeeping staff. PMID:17584935
Atomic Oxygen Lamp Cleaning Facility Fabricated and Tested
NASA Technical Reports Server (NTRS)
Sechkar, Edward A.; Stueber, Thomas J.
1999-01-01
NASA Lewis Research Center's Atomic Oxygen Lamp Cleaning Facility was designed to produce an atomic oxygen plasma within a metal halide lamp to remove carbon-based contamination. It is believed that these contaminants contribute to the high failure rate realized during the production of these lamps. The facility is designed to evacuate a metal halide lamp and produce a radio frequency generated atomic oxygen plasma within it. Oxygen gas, with a purity of 0.9999 percent and in the pressure range of 150 to 250 mtorr, is used in the lamp for plasma generation while the lamp is being cleaned. After cleaning is complete, the lamp can be backfilled with 0.9999-percent pure nitrogen and torch sealed. The facility comprises various vacuum components connected to a radiation-shielded box that encloses the bulb during operation. Radiofrequency power is applied to the two parallel plates of a capacitor, which are on either side of the lamp. The vacuum pump used, a Leybold Trivac Type D4B, has a pumping speed of 4-m3/hr, has an ultimate pressure of <8x10-4, and is specially adapted for pure oxygen service. The electronic power supply, matching network, and controller (500-W, 13.56-MHz) used to supply the radiofrequency power were purchased from RF Power Products Inc. Initial test results revealed that this facility could remove the carbon-based contamination from within bulbs.
NASA Astrophysics Data System (ADS)
Zaijin, Li; Liming, Hu; Ye, Wang; Ye, Yang; Hangyu, Peng; Jinlong, Zhang; Li, Qin; Yun, Liu; Lijun, Wang
2010-03-01
A novel process for the wet cleaning of GaAs surface is presented. It is designed for technological simplicity and minimum damage generated within the GaAs surface. It combines GaAs cleaning with three conditions consisting of (1) removal of thermodynamically unstable species and (2) surface oxide layers must be completely removed after thermal cleaning, and (3) a smooth surface must be provided. Revolving ultrasonic atomization technology is adopted in the cleaning process. At first impurity removal is achieved by organic solvents; second NH4OH:H2O2:H2O = 1:1:10 solution and HCl: H2O2:H2O = 1:1:20 solution in succession to etch a very thin GaAs layer, the goal of the step is removing metallic contaminants and forming a very thin oxidation layer on the GaAs wafer surface; NH4OH:H2O = 1:5 solution is used as the removed oxide layers in the end. The effectiveness of the process is demonstrated by the operation of the GaAs wafer. Characterization of the oxide composition was carried out by X-ray photoelectron spectroscopy. Metal-contamination and surface morphology was observed by a total reflection X-ray fluorescence spectroscopy and atomic force microscope. The research results show that the cleaned surface is without contamination or metal contamination. Also, the GaAs substrates surface is very smooth for epitaxial growth using the rotary ultrasonic atomization technology.
Achieving surface chemical and morphologic alterations on tantalum by plasma electrolytic oxidation.
Goularte, Marcelo Augusto Pinto Cardoso; Barbosa, Gustavo Frainer; da Cruz, Nilson Cristino; Hirakata, Luciana Mayumi
2016-12-01
Search for materials that may either replace titanium dental implants or constitute an alternative as a new dental implant material has been widely studied. As well, the search for optimum biocompatible metal surfaces remains crucial. So, the aim of this work is to develop an oxidized surface layer on tantalum using plasma electrolytic oxidation (PEO) similar to those existing on oral implants been marketed today. Cleaned tantalum samples were divided into group 1 (control) and groups 2, 3, and 4 (treated by PEO for 1, 3, and 5 min, respectively). An electrolytic solution diluted in 1-L deionized water was used for the anodizing process. Then, samples were washed with anhydrous ethyl alcohol and dried in the open air. For complete anodic treatment disposal, the samples were immersed in acetone altogether, taken to the ultrasonic tank for 10 min, washed again in distilled water, and finally air-dried. For the scanning electron microscopy (SEM) analysis, all samples were previously coated with gold; the salt deposition analysis was conducted with an energy-dispersive X-ray spectroscopy (EDS) system integrated with the SEM unit. SEM images confirmed the changes on tantalum strips surface according to different exposure times while EDS analysis confirmed increased salt deposition as exposure time to the anodizing process also increased. PEO was able to produce both surface alteration and salt deposition on tantalum strips similar to those existing on oral implants been marketed today.
Contamination removal using various solvents and methodologies
NASA Technical Reports Server (NTRS)
Jeppsen, J. C.
1989-01-01
Critical and non-critical bonding surfaces must be kept free of contamination that may cause potential unbonds. For example, an aft-dome section of a redesigned solid rocket motor that had been contaminated with hydraulic oil did not appear to be sufficiently cleaned when inspected by the optically stimulated electron emission process (Con Scan) after it had been cleaned using a hand double wipe cleaning method. As a result, current and new cleaning methodologies as well as solvent capability in removing various contaminant materials were reviewed and testing was performed. Bonding studies were also done to verify that the cleaning methods used in removing contaminants provide an acceptable bonding surface. The removal of contaminants from a metal surface and the strength of subsequent bonds were tested using the Martin Marietta and double-wipe cleaning methods. Results are reported.
Chemical resistance and cleanability of glazed surfaces
NASA Astrophysics Data System (ADS)
Hupa, Leena; Bergman, Roger; Fröberg, Linda; Vane-Tempest, Stina; Hupa, Mikko; Kronberg, Thomas; Pesonen-Leinonen, Eija; Sjöberg, Anna-Maija
2005-06-01
Adhesion of soil on glazed surfaces and their cleanability depends on chemical composition, phase composition, and roughness of the surface. The surface can be glossy consisting mainly of a smooth glassy phase. A matt and rough surface consists of a glassy phase and one or more crystalline phases. The origin and composition of the crystalline phases affect the chemical resistance and the cleanability of the surface. Fifteen experimental glossy and matt glazes were soaked in a slightly alkaline cleaning agent solution. The surfaces were spin-coated with sebum, i.e. a soil component typical for sanitary facilities. After wiping out the soil film in a controlled manner, the surface conditions and the soil left were evaluated with colour measurements, SEM/EDXA and COM. The results show that wollastonite-type crystals in the glaze surfaces were attacked in aqueous solutions containing typical cleaning agents. This corrosion led to significant decrease in the cleanability of the surface. The other crystal types observed, i.e. diopside and quartz crystals were not corroded, and the cleanability of glazes containing only these crystals was not changed in the cleaning agent exposures. Also the glassy phase was found to be attacked in some formulations leading to a somewhat decreased cleanability. The repeated soiling and cleaning procedures indicated that soil is accumulated on rough surfaces and surfaces which were clearly corroded by the cleaning agent.
Precision cleaning apparatus and method
Schneider, T.W.; Frye, G.C.; Martin, S.J.
1998-01-13
A precision cleaning apparatus and method are disclosed. The precision cleaning apparatus includes a cleaning monitor further comprising an acoustic wave cleaning sensor such as a quartz crystal microbalance (QCM), a flexural plate wave (FPW) sensor, a shear horizontal acoustic plate mode (SH--APM) sensor, or a shear horizontal surface acoustic wave (SH--SAW) sensor; and measurement means connectable to the sensor for measuring in-situ one or more electrical response characteristics that vary in response to removal of one or more contaminants from the sensor and a workpiece located adjacent to the sensor during cleaning. Methods are disclosed for precision cleaning of one or more contaminants from a surface of the workpiece by means of the cleaning monitor that determines a state of cleanliness and any residual contamination that may be present after cleaning; and also for determining an effectiveness of a cleaning medium for removing one or more contaminants from a workpiece. 11 figs.
Precision cleaning apparatus and method
Schneider, Thomas W.; Frye, Gregory C.; Martin, Stephen J.
1998-01-01
A precision cleaning apparatus and method. The precision cleaning apparatus includes a cleaning monitor further comprising an acoustic wave cleaning sensor such as a quartz crystal microbalance (QCM), a flexural plate wave (FPW) sensor, a shear horizontal acoustic plate mode (SH--APM) sensor, or a shear horizontal surface acoustic wave (SH--SAW) sensor; and measurement means connectable to the sensor for measuring in-situ one or more electrical response characteristics that vary in response to removal of one or more contaminants from the sensor and a workpiece located adjacent to the sensor during cleaning. Methods are disclosed for precision cleaning of one or more contaminants from a surface of the workpiece by means of the cleaning monitor that determines a state of cleanliness and any residual contamination that may be present after cleaning; and also for determining an effectiveness of a cleaning medium for removing one or more contaminants from a workpiece.
Evaluation of various cleaning methods to remove bacillus spores from spacecraft hardware materials
NASA Technical Reports Server (NTRS)
Venkateswaran, Kasthuri; Chung, Shirley; Allton, Judith; Kern, Roger
2004-01-01
A detailed study was made of the biological cleaning effectiveness, defined in terms of the ability to remove bacterial spores, of a number of methods used to clean hardware surfaces. Aluminum (Al 6061) and titanium (Ti 6Al-4V) were chosen for the study as they were deemed the two materials most likely to be used in spacecraft extraterrestrial sampler construction. Metal coupons (1 cm x 2.5 cm) were precleaned and inoculated with 5.8 x 10(3) cultivable Bacillus subtilis spores, which are commonly found on spacecraft surfaces and in the assembly environments. The inoculated coupons were subsequently cleaned using: (1) 70% isopropyl alcohol wipe; (2) water wipe; (3) multiple-solvent flight-hardware cleaning procedures used at the Jet Propulsion Laboratory (JPL); (4) Johnson Space Center-developed ultrapure water rinse; and (5) a commercial, semi-aqueous, multiple-solvent (SAMS) cleaning process. The biological cleaning effectiveness was measured by agar plate assay, sterility test (growing in liquid media), and epifluorescent microscopy. None of the cleaning protocols tested completely removed viable spores from the surface of the aluminum. In contrast, titanium was capable of being cleaned to sterility by two methods, the JPL standard and the commercial SAMS cleaning process. Further investigation showed that the passivation step employed in the JPL standard method is an effective surface sterilant on both metals but not compatible with aluminum. It is recommended that titanium (Ti 6Al-4V) be considered superior to aluminum (Al 6061) for use in spacecraft sampling hardware, both for its potential to be cleaned to sterilization and for its ability to withstand the most effective cleaning protocols.
Evaluation of Various Cleaning Methods to Remove Bacillus Spores from Spacecraft Hardware Materials
NASA Astrophysics Data System (ADS)
Venkateswaran, Kasthuri; Chung, Shirley; Allton, Judith; Kern, Roger
2004-09-01
A detailed study was made of the biological cleaning effectiveness, defined in terms of the ability to remove bacterial spores, of a number of methods used to clean hardware surfaces. Aluminum (Al 6061) and titanium (Ti 6Al-4V) were chosen for the study as they were deemed the two materials most likely to be used in spacecraft extraterrestrial sampler construction. Metal coupons (1 cm × 2.5 cm) were precleaned and inoculated with 5.8 × 103 cultivable Bacillus subtilis spores, which are commonly found on spacecraft surfaces and in the assembly environments. The inoculated coupons were subsequently cleaned using: (1) 70% isopropyl alcohol wipe; (2) water wipe; (3) multiple-solvent flight-hardware cleaning procedures used at the Jet Propulsion Laboratory (JPL); (4) Johnson Space Center-developed ultrapure water rinse; and (5) a commercial, semi-aqueous, multiple-solvent (SAMS) cleaning process. The biological cleaning effectiveness was measured by agar plate assay, sterility test (growing in liquid media), and epifluorescent microscopy. None of the cleaning protocols tested completely removed viable spores from the surface of the aluminum. In contrast, titanium was capable of being cleaned to sterility by two methods, the JPL standard and the commercial SAMS cleaning process. Further investigation showed that the passivation step employed in the JPL standard method is an effective surface sterilant on both metals but not compatible with aluminum. It is recommended that titanium (Ti 6Al-4V) be considered superior to aluminum (Al 6061) for use in spacecraft sampling hardware, both for its potential to be cleaned to sterilization and for its ability to withstand the most effective cleaning protocols.
Evaluation of various cleaning methods to remove bacillus spores from spacecraft hardware materials.
Venkateswaran, Kasthuri; Chung, Shirley; Allton, Judith; Kern, Roger
2004-01-01
A detailed study was made of the biological cleaning effectiveness, defined in terms of the ability to remove bacterial spores, of a number of methods used to clean hardware surfaces. Aluminum (Al 6061) and titanium (Ti 6Al-4V) were chosen for the study as they were deemed the two materials most likely to be used in spacecraft extraterrestrial sampler construction. Metal coupons (1 cm x 2.5 cm) were precleaned and inoculated with 5.8 x 10(3) cultivable Bacillus subtilis spores, which are commonly found on spacecraft surfaces and in the assembly environments. The inoculated coupons were subsequently cleaned using: (1) 70% isopropyl alcohol wipe; (2) water wipe; (3) multiple-solvent flight-hardware cleaning procedures used at the Jet Propulsion Laboratory (JPL); (4) Johnson Space Center-developed ultrapure water rinse; and (5) a commercial, semi-aqueous, multiple-solvent (SAMS) cleaning process. The biological cleaning effectiveness was measured by agar plate assay, sterility test (growing in liquid media), and epifluorescent microscopy. None of the cleaning protocols tested completely removed viable spores from the surface of the aluminum. In contrast, titanium was capable of being cleaned to sterility by two methods, the JPL standard and the commercial SAMS cleaning process. Further investigation showed that the passivation step employed in the JPL standard method is an effective surface sterilant on both metals but not compatible with aluminum. It is recommended that titanium (Ti 6Al-4V) be considered superior to aluminum (Al 6061) for use in spacecraft sampling hardware, both for its potential to be cleaned to sterilization and for its ability to withstand the most effective cleaning protocols.
NASA Technical Reports Server (NTRS)
Swaim, Benji D.
1989-01-01
Modified orifice for variable-polarity plasma-arc welding directs welding plume so it creates clean, even welds on both Inconel(R) and aluminum alloys. Includes eight holes to relieve back pressure in plasma. Quality of welds on ferrous and nonferrous alloys improved as result.
Post-ion beam induced degradation of copper layers in transmission electron microscopy specimens
NASA Astrophysics Data System (ADS)
Seidel, F.; Richard, O.; Bender, H.; Vandervorst, W.
2015-11-01
Copper containing transmission electron microscopy (TEM) specimens frequently show corrosion after focused ion beam (FIB) preparation. This paper reveals that the corrosion product is a Cu-S phase growing over the specimen surface. The layer is identified by energy-dispersive x-ray spectroscopy, and lattice spacing indexing of power spectra patterns. The corrosion process is further studied by TEM on cone-shaped specimens, which are intentionally stored after FIB preparation with S flakes for short time. Furthermore, a protective method against corrosion is developed by varying the time in the FIB vacuum and the duration of a subsequent plasma cleaning.
Véliz, Elena; Vergara, Teresa; Pearcy, Mercedes; Dabanch, Jeannette
Introduction Dental care has become a challenge for healthcare associated infection prevention programs, since the environment, within other factors, plays an important role in the transmission chain. Materials and Methods An intervention program was designed for the Dental Unit of Hospital Militar de Santiago, between years 2014 and 2015. The program contemplated 3 stages: diagnostic, intervention and evaluation stage. Objective To improve the safety of critical surfaces involved in dental healthcare. Results During the diagnostic stage, the cleaning and disinfection process was found to be deficient. The most contaminated critical surface was the instrument holder unit, then the clean area and lamp handle. The surfaces that significantly reduced their contamination, after the intervention, were the clean area and the instrument carrier unit. Conclusion Training in the processes of cleaning and disinfecting surfaces and dental equipment is one of the cost-effective strategies in preventing healthcare-associated infections (HCAI), with simple and easy-to-apply methods.
1991-01-01
Plasmodesmata or intercellular bridges that connect plant cells are cylindrical channels approximately 40 nm in diameter. Running through the center of each is a dense rod, the desmotubule, that is connected to the endoplasmic reticulum of adjacent cells. Fern, Onoclea sensibilis, gametophytes were cut in half and the cut surfaces exposed to the detergent, Triton X 100, then fixed. Although the plasma membrane limiting the plasmodesma is solubilized partially or completely, the desmotubule remains intact. Alternatively, if the cut surface is exposed to papain, then fixed, the desmotubule disappears, but the plasma membrane limiting the plasmodesmata remains intact albeit swollen and irregular in profile. Gametophytes were plasmolyzed, and then fixed. As the cells retract from their cell walls they leave behind the plasmodesmata still inserted in the cell wall. They can break cleanly when the cell proper retracts or can pull away portions of the plasma membrane of the cell with them. Where the desmotubule remains intact, the plasmodesma retains its shape. These images and the results with detergents and proteases indicate that the desmotubule provides a cytoskeletal element for each plasmodesma, an element that not only stabilizes the whole structure, but also limits its size and porosity. It is likely to be composed in large part of protein. Suggestions are made as to why this structure has been selected for in evolution. PMID:1993740
Study of gas adsorption on as-produced and modified carbon nanotubes
NASA Astrophysics Data System (ADS)
Rawat, Dinesh Singh
Volumetric adsorption isotherm measurements were used to study the adsorption characteristics of Ethane (C2H6) and Butane (C 4H10) on as-produced single-walled carbon nanotubes. The binding energy of the adsorbed alkane molecule was found to increase with increasing carbon chain length. Two adsorption substeps were obtained for each alkane molecule. However, the size of the high pressure substep was found to be gradually smearing with the increase in size of the adsorbed molecule. This phenomenon is interpreted as size entropy effect for linear molecules. This interpretation was also verified by determining the specific surface area of the substrate using linear molecules of different sizes. Kinetics measurements of alkane adsorption on SWNTs were also conducted and their dependence on the molecular length was determined. Similar adsorption measurements were performed for Argon (Ar) on as-produced single-walled carbon nanotubes and nanotubes that were structurally modified using acid treatment. Enhancement of the sorptive capacity and the presence of two distinct kinetics of gas adsorption verified partial opening of single walled carbon nanotubes as a result of chemical treatment. Mutiwalled carbon nanotubes were exposed to oxygen plasma treatment for varying time periods. Afterwards, adsorption measurements of Methane (CH 4) were conducted on untreated and oxygen plasma treated tubes. The presence of an additional substep, after exposing multiwalled carbon nanotubes to oxygen plasma for varying time periods, suggested progressive cleaning of nanotube surface.
Fogging technique used to coat magnesium with plastic
NASA Technical Reports Server (NTRS)
Mroz, T. S.
1967-01-01
Cleaning process and a fogging technique facilitate the application of a plastic coating to magnesium plates. The cleaning process removes general organic and inorganic surface impurities, oils and greases, and oxides and carbonates from the magnesium surfaces. The fogging technique produces a thin-filmlike coating in a clean room atmosphere.
Dippenaar, Ricky; Smith, Johan
2018-02-23
Expressed human milk (EHM) feed preparation areas represent a potential source of unintentional nosocomial infection. Daily disinfection of environmental surfaces remains an essential intervention to mitigate nosocomial infections. The inefficiency of conventional cleaning and disinfection contributes to an increased risk for the acquisition of multi-drug resistant pathogens. "Non touch" technologies such as the pulsed xenon ultraviolet (PX-UVD) light device have documented sustained reduction in surface bacterial colonization and reduced cross contamination. The impact of a PX-UVD on surface colony forming units per square centimeter (cfu/cm 2 ) in feed preparation areas was evaluated following its implementation as standard care. A quasi-experimental study was performed documenting bacterial colonization from 6 high risk feed preparation areas in a community care hospital in South Africa. Pre and post conventional cleaning neutralizing rinse swabs were collected fortnightly over a 16 week control period prior to the introduction of the PX-UVD and compared to a matching set of samples for the PX-UVD period. A 90% reduction in total surface bioburden was noted from the control period (544 cfu/cm 2 ) compared to the corresponding PX-UVD period (50 cfu/cm 2 ). Sub -analysis of both the Pre-clean Control: Pre-clean PX-UVD counts as well as the Post-clean Control: Post-clean PX-UVD counts noted significant improvements (p < 0.001). A statistically significant improvement was noted between pre-and post-cleaning total surface bioburden following exposure to the PX-UVD (p = 0.0004). The introduction of the PX-UVD was associated with a sustained reduction in the pre clean bioburden counts with a risk trend (per week) 0.19, (95% CI [0.056, 0.67], p = 0.01). The use of a PX-UVD as adjunct to standard cleaning protocols was associated with a significant decrease in surface bioburden. The study demonstrated the inefficiency of conventional cleaning. Persistence of potentially pathological species in both periods highlights current health sector challenges.
Evaluating a new paradigm for comparing surface disinfection in clinical practice.
Carling, Philip C; Perkins, Jennifer; Ferguson, JoAnn; Thomasser, Anita
2014-11-01
Despite an increasing understanding of the importance of near-patient surfaces in the transmission of healthcare-associated pathogens, there remains a need to define the relative clinical effectiveness of disinfection interventions. A serial 2-phase evaluation of the clinical effectiveness of 2 surface disinfectants. A general acute care hospital. A unique system for quantifying bioburden reduction while monitoring the possible impact of differences in cleaning thoroughness was used to compare the clinical effectiveness of a traditional quaternary ammonium compound (QAC) and a novel peracetic acid/hydrogen peroxide disinfectant (ND) as part of terminal room cleaning. As a result of QAC cleaning, 93 (40%) of 237 cleaned surfaces confirmed by fluorescent marker (DAZO) removal were found to have complete removal of aerobic bioburden. During the ND phase of the study, bioburden was removed from 211 (77%) of 274 cleaned surfaces. Because there was no difference in the thoroughness of cleaning with either disinfectant (65.3% and 66.4%), the significant ([Formula: see text]) difference in bioburden reduction can be attributed to better cleaning efficacy with the ND. In the context of the study design, the ND was 1.93 times more effective in removing bacterial burden than the QAC ([Formula: see text]). Furthermore, the study design represents a new research paradigm in which 2 interventions can be compared by concomitantly and objectively analyzing both the product and process variables in a manner that can be used to define the relative effectiveness of all disinfection cleaning interventions.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Grate, Jay W.; Warner, Marvin G.; Pittman, Jonathan W.
2013-08-05
The wettability of silicon and glass surfaces can be modified by silanization. However, similar treatments of glass and silica surfaces using the same silane do not necessarily yield the same wettability as determined by the oil-water contact angle. In this technical note, surface cleaning pretreatments were investigated to determine conditions that would yield oil-wet surfaces on glass with similar wettability to silica surfaces treated with the same silane, and both air-water and oil-water contact angles were determined. Air-water contact angles were less sensitive to differences between silanized silica and glass surfaces, often yielding similar values while the oil-water contact anglesmore » were quite different. Borosilicate glass surfaces cleaned with standard cleaning solution 1 (SC1) yield intermediate-wet surfaces when silanized with hexamethyldisilazane, while the same cleaning and silanization yields oil-wet surfaces on silica. However, cleaning glass in boiling concentrated nitric acid creates a surface that can be silanized to obtain oil-wet surfaces using HDMS. Moreover, this method is effective on glass with prior thermal treatment at an elevated temperature of 400oC. In this way, silica and glass can be silanized to obtain equally oil-wet surfaces using HMDS. It is demonstrated that pretreatment and silanization is feasible in silicon-silica/glass micromodels previously assembled by anodic bonding, and that the change in wettability has a significant observable effect on immiscisble fluid displacements in the pore network.« less
Assessment of disinfection of hospital surfaces using different monitoring methods1
Ferreira, Adriano Menis; de Andrade, Denise; Rigotti, Marcelo Alessandro; de Almeida, Margarete Teresa Gottardo; Guerra, Odanir Garcia; dos Santos, Aires Garcia
2015-01-01
OBJECTIVE: to assess the efficiency of cleaning/disinfection of surfaces of an Intensive Care Unit. METHOD: descriptive-exploratory study with quantitative approach conducted over the course of four weeks. Visual inspection, bioluminescence adenosine triphosphate and microbiological indicators were used to indicate cleanliness/disinfection. Five surfaces (bed rails, bedside tables, infusion pumps, nurses' counter, and medical prescription table) were assessed before and after the use of rubbing alcohol at 70% (w/v), totaling 160 samples for each method. Non-parametric tests were used considering statistically significant differences at p<0.05. RESULTS: after the cleaning/disinfection process, 87.5, 79.4 and 87.5% of the surfaces were considered clean using the visual inspection, bioluminescence adenosine triphosphate and microbiological analyses, respectively. A statistically significant decrease was observed in the disapproval rates after the cleaning process considering the three assessment methods; the visual inspection was the least reliable. CONCLUSION: the cleaning/disinfection method was efficient in reducing microbial load and organic matter of surfaces, however, these findings require further study to clarify aspects related to the efficiency of friction, its frequency, and whether or not there is association with other inputs to achieve improved results of the cleaning/disinfection process. PMID:26312634
Assessment of disinfection of hospital surfaces using different monitoring methods.
Ferreira, Adriano Menis; de Andrade, Denise; Rigotti, Marcelo Alessandro; de Almeida, Margarete Teresa Gottardo; Guerra, Odanir Garcia; dos Santos Junior, Aires Garcia
2015-01-01
to assess the efficiency of cleaning/disinfection of surfaces of an Intensive Care Unit. descriptive-exploratory study with quantitative approach conducted over the course of four weeks. Visual inspection, bioluminescence adenosine triphosphate and microbiological indicators were used to indicate cleanliness/disinfection. Five surfaces (bed rails, bedside tables, infusion pumps, nurses' counter, and medical prescription table) were assessed before and after the use of rubbing alcohol at 70% (w/v), totaling 160 samples for each method. Non-parametric tests were used considering statistically significant differences at p<0.05. after the cleaning/disinfection process, 87.5, 79.4 and 87.5% of the surfaces were considered clean using the visual inspection, bioluminescence adenosine triphosphate and microbiological analyses, respectively. A statistically significant decrease was observed in the disapproval rates after the cleaning process considering the three assessment methods; the visual inspection was the least reliable. the cleaning/disinfection method was efficient in reducing microbial load and organic matter of surfaces, however, these findings require further study to clarify aspects related to the efficiency of friction, its frequency, and whether or not there is association with other inputs to achieve improved results of the cleaning/disinfection process.
Agarwal, Manika; Wible, Emily; Ramir, Tyler; Altun, Sibel; Viana, Grace; Evans, Carla; Lukic, Henry; Megremis, Spiro; Atsawasuwan, Phimon
2018-05-01
To evaluate the long-term effects of seven different cleaning methods on light transmittance, surface roughness, and flexural modulus of a polyurethane retainer material. Polyurethane retainer specimens (Vivera®, Align Technology Inc) (70 specimens, n = 10 per method, 50.8 mm × 12.7 mm × 1.0 mm) were exposed to seven cleaning methods twice a week for 6 months. Before treatment and after 6 months, light transmittance, surface roughness, and flexural modulus of the specimens were quantified. Qualitative assessment of randomly selected specimens from each solution was performed at baseline and after 6 months using a scanning electron microscope. Statistical analyses were performed at the .05 significance level. Of the three test variables, light transmittance through the specimens was the only one that changed significantly from baseline to 6 months for all cleaning solutions, with all of them causing a decrease. However, except for 0.6% sodium hypochlorite showing a change in surface roughness values and 2.5% vinegar and toothbrushing showing an increase in flexural modulus, none of the other four cleaning methods resulted in significant changes in surface roughness or flexural modulus values for the polyurethane specimens between baseline and after 6 months. Of the seven cleaning methods, Invisalign® cleaning crystals, Polident®, and Listerine® showed the least amount of change in light transmittance values for the polyurethane specimens over 6 months, and they had no effect on surface roughness and flexural modulus values.
Hard surface biocontrol in hospitals using microbial-based cleaning products.
Vandini, Alberta; Temmerman, Robin; Frabetti, Alessia; Caselli, Elisabetta; Antonioli, Paola; Balboni, Pier Giorgio; Platano, Daniela; Branchini, Alessio; Mazzacane, Sante
2014-01-01
Healthcare-Associated Infections (HAIs) are one of the most frequent complications occurring in healthcare facilities. Contaminated environmental surfaces provide an important potential source for transmission of many healthcare-associated pathogens, thus indicating the need for new and sustainable strategies. This study aims to evaluate the effect of a novel cleaning procedure based on the mechanism of biocontrol, on the presence and survival of several microorganisms responsible for HAIs (i.e. coliforms, Staphyloccus aureus, Clostridium difficile, and Candida albicans) on hard surfaces in a hospital setting. The effect of microbial cleaning, containing spores of food grade Bacillus subtilis, Bacillus pumilus and Bacillus megaterium, in comparison with conventional cleaning protocols, was evaluated for 24 weeks in three independent hospitals (one in Belgium and two in Italy) and approximately 20000 microbial surface samples were collected. Microbial cleaning, as part of the daily cleaning protocol, resulted in a reduction of HAI-related pathogens by 50 to 89%. This effect was achieved after 3-4 weeks and the reduction in the pathogen load was stable over time. Moreover, by using microbial or conventional cleaning alternatively, we found that this effect was directly related to the new procedure, as indicated by the raise in CFU/m2 when microbial cleaning was replaced by the conventional procedure. Although many questions remain regarding the actual mechanisms involved, this study demonstrates that microbial cleaning is a more effective and sustainable alternative to chemical cleaning and non-specific disinfection in healthcare facilities. This study indicates microbial cleaning as an effective strategy in continuously lowering the number of HAI-related microorganisms on surfaces. The first indications on the actual level of HAIs in the trial hospitals monitored on a continuous basis are very promising, and may pave the way for a novel and cost-effective strategy to counteract or (bio)control healthcare-associated pathogens.
Hard Surface Biocontrol in Hospitals Using Microbial-Based Cleaning Products
Vandini, Alberta; Temmerman, Robin; Frabetti, Alessia; Caselli, Elisabetta; Antonioli, Paola; Balboni, Pier Giorgio; Platano, Daniela; Branchini, Alessio; Mazzacane, Sante
2014-01-01
Background Healthcare-Associated Infections (HAIs) are one of the most frequent complications occurring in healthcare facilities. Contaminated environmental surfaces provide an important potential source for transmission of many healthcare-associated pathogens, thus indicating the need for new and sustainable strategies. Aim This study aims to evaluate the effect of a novel cleaning procedure based on the mechanism of biocontrol, on the presence and survival of several microorganisms responsible for HAIs (i.e. coliforms, Staphyloccus aureus, Clostridium difficile, and Candida albicans) on hard surfaces in a hospital setting. Methods The effect of microbial cleaning, containing spores of food grade Bacillus subtilis, Bacillus pumilus and Bacillus megaterium, in comparison with conventional cleaning protocols, was evaluated for 24 weeks in three independent hospitals (one in Belgium and two in Italy) and approximately 20000 microbial surface samples were collected. Results Microbial cleaning, as part of the daily cleaning protocol, resulted in a reduction of HAI-related pathogens by 50 to 89%. This effect was achieved after 3–4 weeks and the reduction in the pathogen load was stable over time. Moreover, by using microbial or conventional cleaning alternatively, we found that this effect was directly related to the new procedure, as indicated by the raise in CFU/m2 when microbial cleaning was replaced by the conventional procedure. Although many questions remain regarding the actual mechanisms involved, this study demonstrates that microbial cleaning is a more effective and sustainable alternative to chemical cleaning and non-specific disinfection in healthcare facilities. Conclusions This study indicates microbial cleaning as an effective strategy in continuously lowering the number of HAI-related microorganisms on surfaces. The first indications on the actual level of HAIs in the trial hospitals monitored on a continuous basis are very promising, and may pave the way for a novel and cost-effective strategy to counteract or (bio)control healthcare-associated pathogens. PMID:25259528
Cleaning of printed circuit assemblies with surface-mounted components
NASA Astrophysics Data System (ADS)
Arzigian, J. S.
The need for ever-increasing miniaturization of airborne instrumentation through the use of surface mounted components closely placed on printed circuit boards highlights problems with traditional board cleaning methods. The reliability of assemblies which have been cleaned with vapor degreasing and spray cleaning can be seriously compromised by residual contaminants leading to solder joint failure, board corrosion, and even electrical failure of the mounted parts. In addition, recent government actions to eliminate fully halogenated chlorofluorocarbons (CFC) and chlorinated hydrocarbons from the industrial environment require the development of new cleaning materials and techniques. This paper discusses alternative cleaning materials and techniques and results that can be expected with them. Particular emphasis is placed on problems related to surface-mounted parts. These new techniques may lead to improved circuit reliability and, at the same time, be less expensive and less environmentally hazardous than the traditional systems.
Alternative, Green Processes for the Precision Cleaning of Aerospace Hardware
NASA Technical Reports Server (NTRS)
Maloney, Phillip R.; Grandelli, Heather Eilenfield; Devor, Robert; Hintze, Paul E.; Loftin, Kathleen B.; Tomlin, Douglas J.
2014-01-01
Precision cleaning is necessary to ensure the proper functioning of aerospace hardware, particularly those systems that come in contact with liquid oxygen or hypergolic fuels. Components that have not been cleaned to the appropriate levels may experience problems ranging from impaired performance to catastrophic failure. Traditionally, this has been achieved using various halogenated solvents. However, as information on the toxicological and/or environmental impacts of each came to light, they were subsequently regulated out of use. The solvent currently used in Kennedy Space Center (KSC) precision cleaning operations is Vertrel MCA. Environmental sampling at KSC indicates that continued use of this or similar solvents may lead to high remediation costs that must be borne by the Program for years to come. In response to this problem, the Green Solvents Project seeks to develop state-of-the-art, green technologies designed to meet KSCs precision cleaning needs.Initially, 23 solvents were identified as potential replacements for the current Vertrel MCA-based process. Highly halogenated solvents were deliberately omitted since historical precedents indicate that as the long-term consequences of these solvents become known, they will eventually be regulated out of practical use, often with significant financial burdens for the user. Three solvent-less cleaning processes (plasma, supercritical carbon dioxide, and carbon dioxide snow) were also chosen since they produce essentially no waste stream. Next, experimental and analytical procedures were developed to compare the relative effectiveness of these solvents and technologies to the current KSC standard of Vertrel MCA. Individually numbered Swagelok fittings were used to represent the hardware in the cleaning process. First, the fittings were cleaned using Vertrel MCA in order to determine their true cleaned mass. Next, the fittings were dipped into stock solutions of five commonly encountered contaminants and were weighed again showing typical contaminant deposition levels of approximately 0.00300g per part. They were then cleaned by the solvent or process being tested and then weighed a third time which allowed for the calculation of the cleaning efficiency of the test solvent or process.Based on preliminary experiments, five solvents (ethanol, isopropanol, acetone, ethyl acetate, and tert-butyl acetate) were down selected for further testing. When coupled with ultrasonic agitation, these solvents removed hydrocarbon contaminants as well as Vertrel MCA and showed improved removal of perfluorinated greases. Supercritical carbon dioxide did an excellent job dissolving each of the five contaminants but did a poor job of removing Teflon particles found in the perfluorinated greases. Plasma cleaning efficiency was found to be dependent on which supply gas was used, exposure time, and gas pressure. Under optimized conditions it was found that breathing air, energized to the plasma phase, was able to remove nearly 100% of the contamination.These findings indicate that alternative cleaning methods are indeed able to achieve precision levels of cleanliness. Currently, our team is working with a commercial cleaning company to get independent verification of our results. We are also evaluating the technical and financial aspects of scaling these processes to a size capable of supporting the future cleaning needs of KSC.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Hobbs, B.; Kahabka, J.
1995-06-01
This paper discusses the use of a mechanical brush cleaning technology recently used to remove biofouling from the Circulating Water (CW) System at New York Power Authority`s James A. FitzPatrick Nuclear Power Plant. The FitzPatrick plant had previously used chemical molluscicide to treat zebra mussels in the CW system. Full system treatment was performed in 1992 with limited forebay/screenwell treatment in 1993. The New York Power Authority (NYPA) decided to conduct a mechanical cleaning of the intake system in 1994. Specific project objectives included: (1) Achieve a level of surface cleaniness greater than 98%; (2) Remove 100% of debris, bothmore » existing sediment and debris generated as a result of cleaning; (3) Inspect all surfaces and components, identifying any problem areas; (4) Complete the task in a time frame within the 1994-95 refueling outage schedule window, and; (5) Determine if underwater mechanical cleaning is a cost-effective zebra mussel control method suitable for future application at FitzPatrick. A pre-cleaning inspection, including underwater video photography, was conducted of each area. Cleaning was accomplished using diver-controlled, multi-brush equipment included the electro-hydraulic powered Submersible Cleaning and Maintenance Platform (SCAMP), and several designs of hand-held machines. The brushes swept all zebra mussels off surfaces, restoring concrete and metal substrates to their original condition. Sensitive areas including pump housings, standpipes, sensor piping and chlorine injection tubing, were cleaned without degradation. Submersible vortex vacuum pumps were used to remove debris from the cavity. More than 46,000 ft{sup 2} of surface area was cleaned and over 460 cubic yards of dewatered debris were removed. As each area was completed, a post-clean inspection with photos and video was performed.« less
Removal of Tin from Extreme Ultraviolet Collector Optics by an In-Situ Hydrogen Plasma
NASA Astrophysics Data System (ADS)
Elg, Daniel Tyler
Throughout the 1980s and 1990s, as the semiconductor industry upheld Moore's Law and continuously shrank device feature sizes, the wavelength of the lithography source remained at or below the resolution limit of the minimum feature size. Since 2001, however, the light source has been the 193nm ArF excimer laser. While the industry has managed to keep up with Moore's Law, shrinking feature sizes without shrinking the lithographic wavelength has required extra innovations and steps that increase fabrication time, cost, and error. These innovations include immersion lithography and double patterning. Currently, the industry is at the 14 nm technology node. Thus, the minimum feature size is an order of magnitude below the exposure wavelength. For the 10 nm node, triple and quadruple patterning have been proposed, causing potentially even more cost, fabrication time, and error. Such a trend cannot continue indefinitely in an economic fashion, and it is desirable to decrease the wavelength of the lithography sources. Thus, much research has been invested in extreme ultraviolet lithography (EUVL), which uses 13.5 nm light. While much progress has been made in recent years, some challenges must still be solved in order to yield a throughput high enough for EUVL to be commercially viable for high-volume manufacturing (HVM). One of these problems is collector contamination. Due to the 92 eV energy of a 13.5 nm photon, EUV light must be made by a plasma, rather than by a laser. Specifically, the industrially-favored EUV source topology is to irradiate a droplet of molten Sn with a laser, creating a dense, hot laser-produced plasma (LPP) and ionizing the Sn to (on average) the +10 state. Additionally, no materials are known to easily transmit EUV. All EUV light must be collected by a collector optic mirror, which cannot be guarded by a window. The plasmas used in EUV lithography sources expel Sn ions and neutrals, which degrade the quality of collector optics. The mitigation of this debris is one of the main problems facing potential manufacturers of EUV sources. which can damage the collector optic in three ways: sputtering, implantation, and deposition. The first two damage processes are irreversible and are caused by the high energies (1-10 keV) of the ion debris. Debris mitigation methods have largely managed to reduce this problem by using collisions with H2 buffer gas to slow down the energetic ions. However, deposition can take place at all ion and neutral energies, and no mitigation method can deterministically deflect all neutrals away from the collector. Thus, deposition still takes place, lowering the collector reflectivity and increasing the time needed to deliver enough EUV power to pattern a wafer. Additionally, even once EUV reaches HVM insertion, source power will need to be continually increased as feature sizes continue to shrink; this increase in source power may potentially come at a cost of increased debris. Thus, debris mitigation solutions that work for the initial generation of commercial EUVL systems may not be adequate for future generations. An in-situ technology to clean collector optics without source downtime is required. which will require an in-situ technology to clean collector optics. The novel cleaning solution described in this work is to create the radicals directly on the collector surface by using the collector itself to drive a capacitively-coupled hydrogen plasma. This allows for radical creation at the desired location without requiring any delivery system and without requiring any source downtime. Additionally, the plasma provides energetic radicals that aid in the etching process. This work will focus on two areas. First, it will focus on experimental collector cleaning and EUV reflectivity restoration. Second, it will focus on developing an understanding of the fundamental processes governing Sn removal. It will be shown that this plasma technique can clean an entire collector optic and restore EUV reflectivity to MLMs without damaging them. Additionally, it will be shown that, within the parameter space explored, the limiting factor in Sn etching is not hydrogen radical flux or SnH4 decomposition but ion energy flux. This will be backed up by experimental measurements, as well as a plasma chemistry model of the radical density and a 3D model of SnH4 transport and redeposition.
Hausemann, A; Hofmann, H; Otto, U; Heudorf, Ursel
2015-06-01
In addition to hand hygiene and reprocessing of medical products, cleaning and disinfection of surfaces is also an important issue in the prevention of germ transmission and by implication infections. Therefore, in 2014, the quality of the structure, process and result of surface preparation of all hospitals in Frankfurt am Main, Germany, was monitored. All 17 hospitals transferred information on the quality of structure. Process quality was obtained through direct observation during cleaning and disinfection of rooms and their plumbing units. Result quality was gained using the fluorescent method, i.e. marking surfaces with a fluorescent liquid and testing if this mark has been sufficiently removed by cleaning. Structure quality: in all hospitals the employees were trained regularly. In 12 of them, the foremen had the required qualifications, in 6 hospitals unclarity as to the intersection of the cleaning and care services remained. In 14 hospitals only visible contamination was cleaned on the weekends, whereas complete cleaning was reported to take place in 12 hospitals on Saturdays and in 2 hospitals on Sundays. The contractually stipulated cleaning (observations specified in brackets) averaged 178 m(2)/h (148 m(2)/h) per patient room and 69 m(2)/h (33 m(2)/h) for bathrooms. Process quality: during process monitoring, various hand contact surfaces were prepared insufficiently. Result quality: 63 % of fluorescent markings were appropriately removed. The need for improvement is given especially in the area of the qualification of the foremen and a in a clear definition of the intersection between cleaning and care services, as well as in the regulations for weekends and public holidays.
Self-Cleaning Surfaces: A Third-Year Undergraduate Research Project
ERIC Educational Resources Information Center
Haines, Ronald S.; Wu, Alex H. F.; Zhang, Hua; Coffey, Jacob; Huddle, Thomas; Lafountaine, Justin S.; Lim, Zhi-Jun; White, Eugene A.; Tuong, Nam T.; Lamb, Robert N.
2009-01-01
Superhydrophobic (non water-wettable) surfaces can possess the ability to self-clean (the so-called "lotus effect"). The task of devising the apparatus and method for quantifying this self-cleaning effect was offered as a project in a third-year undergraduate laboratory course. Using commonly available equipment the students devised a…
NASA Astrophysics Data System (ADS)
Mitteau, R.; Guilhem, D.; Reichle, R.; Vallet, J. C.; Roche, H.; Buravand, Y.; Chantant, M.; Tsitrone, E.; Brosset, C.; Grosman, A.; Chappuis, P.
2006-03-01
Fusion devices with carbon as the main armour material are experiencing a growth in carbonaceous deposits at the surface of the plasma facing components. Tore Supra presents such deposits, and has specific features which influence their growth: long pulse operation and cooled walls. Deposits have a low thermal transfer to the cooled structure so that they appear as hot areas with the infrared imaging system looking at the elements surface temperature during plasma discharges. A 'degree of (carbon) deposit' on the toroidal pumped limiter is estimated by establishing the ratio between the apparent power on the limiter derived from the infrared measure and the actual one, deduced from a power balance analysis between the injected and the radiated power. This criterion is used to monitor the evolution of the deposit average thermal resistance. Successive shots have a similar 'degree of deposit', showing that the evaluation makes sense. Two years of data have been compiled (2003 and 2004), representing 3000 discharges (13 h of plasma, including 30 discharges longer than one minute). A three-fold increase in the 'degree of deposit' over six months is evidenced, following a limiter clean-up early in 2003. A comparison with calorimetric data produces a similar result, albeit less pronounced. Large steps in the degree of deposit are sometimes observed, usually correlated with identified events such as disruption, vessel opening, conditioning or plasma parameters change. It indicates that the deposit thermal resistance can change rapidly, although a systematic correlation with the above mentioned events could not be established.
2015-01-01
Combination of two physical phenomena, capillary pressure gradient and wettability gradient, allows a simple two-step fabrication process that yields a reliable hydrophobic self-cleaning condenser surface. The surface is fabricated with specific microscopic topography and further treatment with a chemically inert low-surface-energy material. This process does not require growth of nanofeatures (nanotubes) or hydrophilic–hydrophobic patterning of the surface. Trapezoidal geometry of the microfeatures facilitates droplet transfer from the Wenzel to the Cassie state and reduces droplet critical diameter. The geometry of the micropatterns enhances local coalescence and directional movement for droplets with diameter much smaller than the radial length of the micropatterns. The hydrophobic self-cleaning micropatterned condenser surface prevents liquid film formation and promotes continuous dropwise condensation cycle. Upon dropwise condensation, droplets follow a designed wettability gradient created with micropatterns from the most hydrophobic to the least hydrophobic end of the surface. The surface has higher condensation efficiency, due to its directional self-cleaning property, than a plain hydrophobic surface. We explain the self-actuated droplet collection mechanism on the condenser surface and demonstrate experimentally the creation of an effective wettability gradient over a 6 mm radial distance. In spite of its fabrication simplicity, the fabricated surface demonstrates self-cleaning property, enhanced condensation performance, and reliability over time. Our work enables creation of a hydrophobic condenser surface with the directional self-cleaning property that can be used for collection of biological (chemical, environmental) aerosol samples or for condensation enhancement. PMID:25073014
Zamuruyev, Konstantin O; Bardaweel, Hamzeh K; Carron, Christopher J; Kenyon, Nicholas J; Brand, Oliver; Delplanque, Jean-Pierre; Davis, Cristina E
2014-08-26
Combination of two physical phenomena, capillary pressure gradient and wettability gradient, allows a simple two-step fabrication process that yields a reliable hydrophobic self-cleaning condenser surface. The surface is fabricated with specific microscopic topography and further treatment with a chemically inert low-surface-energy material. This process does not require growth of nanofeatures (nanotubes) or hydrophilic-hydrophobic patterning of the surface. Trapezoidal geometry of the microfeatures facilitates droplet transfer from the Wenzel to the Cassie state and reduces droplet critical diameter. The geometry of the micropatterns enhances local coalescence and directional movement for droplets with diameter much smaller than the radial length of the micropatterns. The hydrophobic self-cleaning micropatterned condenser surface prevents liquid film formation and promotes continuous dropwise condensation cycle. Upon dropwise condensation, droplets follow a designed wettability gradient created with micropatterns from the most hydrophobic to the least hydrophobic end of the surface. The surface has higher condensation efficiency, due to its directional self-cleaning property, than a plain hydrophobic surface. We explain the self-actuated droplet collection mechanism on the condenser surface and demonstrate experimentally the creation of an effective wettability gradient over a 6 mm radial distance. In spite of its fabrication simplicity, the fabricated surface demonstrates self-cleaning property, enhanced condensation performance, and reliability over time. Our work enables creation of a hydrophobic condenser surface with the directional self-cleaning property that can be used for collection of biological (chemical, environmental) aerosol samples or for condensation enhancement.
Beam cleaning of an incoherent laser via plasma Raman amplification
Edwards, Matthew R.; Qu, Kenan; Mikhailova, Julia M.; ...
2017-09-25
We show that backward Raman amplification in plasma can efficiently compress a temporally incoherent pump laser into an intense coherent amplified seed pulse, provided that the correlation time of the pump is longer than the inverse plasma frequency. One analytical theory for Raman amplification using pump beams with different correlation functions is developed and compared to numerical calculations and particle-in-cell simulations. Since incoherence on scales shorter than the instability growth time suppresses spontaneous noise amplification, we point out a broad regime where quasi-coherent sources may be used as efficient low-noise Raman amplification pumps. As the amplified seed is coherent, Ramanmore » amplification provides an additional a beam-cleaning mechanism for removing incoherence. At near-infrared wavelengths, finite coherence times as short as 50 fs allow amplification with only minor losses in efficiency.« less
Beam cleaning of an incoherent laser via plasma Raman amplification
DOE Office of Scientific and Technical Information (OSTI.GOV)
Edwards, Matthew R.; Qu, Kenan; Mikhailova, Julia M.
We show that backward Raman amplification in plasma can efficiently compress a temporally incoherent pump laser into an intense coherent amplified seed pulse, provided that the correlation time of the pump is longer than the inverse plasma frequency. One analytical theory for Raman amplification using pump beams with different correlation functions is developed and compared to numerical calculations and particle-in-cell simulations. Since incoherence on scales shorter than the instability growth time suppresses spontaneous noise amplification, we point out a broad regime where quasi-coherent sources may be used as efficient low-noise Raman amplification pumps. As the amplified seed is coherent, Ramanmore » amplification provides an additional a beam-cleaning mechanism for removing incoherence. At near-infrared wavelengths, finite coherence times as short as 50 fs allow amplification with only minor losses in efficiency.« less
Peng, Shan; Bhushan, Bharat
2016-01-01
Superoleophobic aluminum surfaces are of interest for self-cleaning, anti-smudge (fingerprint resistance), anti-fouling, and corrosion resistance applications. In the published literature on superoleophobic aluminum surfaces, mechanical durability, self-cleaning, and anti-smudge properties data are lacking. Microstep structure has often been used to prepare superhydrophobic aluminum surfaces which produce the microstructure. The nanoreticula structure has also been used, and is reported to be able to trap air-pockets, which are desirable for a high contact angle. In this work, the microstep and nanoreticula structures were produced on aluminum surfaces to form a hierarchical micro/nanostructure by a simple two-step chemical etching process. The hierarchical structure, when modified with fluorosilane, made the surface superoleophobic. The effect of nanostructure, microstructure, and hierarchical structure on wettability and durability were studied and compared. The superoleophobic aluminum surfaces were found to be wear resistant, self-cleaning, and have anti-smudge and corrosion resistance properties. Copyright © 2015 Elsevier Inc. All rights reserved.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Kerber, Pranita B.; Porter, Lisa M.; McCullough, L. A.
2012-10-12
Nanostructured carbon (ns-C) films fabricated by stabilization and pyrolysis of di-block copolymers are of interest for a variety of electrical/electronic applications due to their chemical inertness, high-temperature insensitivity, very high surface area, and tunable electrical resistivity over a wide range [Kulkarni et al., Synth. Met. 159, (2009) 177]. Because of their high porosity and associated high specific surface area, controlled surface cleaning studies are important for fabricating electronic devices from these films. In this study, quantification of surface composition and surface cleaning studies on ns-C films synthesized by carbonization of di-block copolymers of polyacrylonitrile-b-poly(n-butyl acrylate) (PAN-b-PBA) at two different temperaturesmore » were carried out. X-ray photoelectron spectroscopy was used for elemental analysis and to determine the efficacy of various surface cleaning methods for ns-C films and to examine the polymer residues in the films. The in-situ surface cleaning methods included: HF vapor treatment, vacuum annealing, and exposure to UV-ozone. Quantitative analysis of high-resolution XPS scans showed 11 at. % of nitrogen present in the films pyrolyzed at 600 °C, suggesting incomplete denitrogenation of the copolymer films. The nitrogen atomic concentration reduced significantly for films pyrolyzed at 900 °C confirming extensive denitrogenation at that temperature. Furthermore, quantitative analysis of nitrogen sub-peaks indicated higher loss of nitrogen atoms residing at the edge of graphitic clusters relative to that of nitrogen atoms within the graphitic cluster, suggesting higher graphitization with increasing pyrolysis temperature. Of the surface cleaning methods investigated, in-situ annealing of the films at 300 °C for 40 min was found to be the most efficacious in removing adventitious carbon and oxygen impurities from the surface.« less
DOE Office of Scientific and Technical Information (OSTI.GOV)
Kerber, Pranita; Porter, Lisa M.; McCullough, Lynne A.
2012-11-15
Nanostructured carbon (ns-C) films fabricated by stabilization and pyrolysis of diblock copolymers are of interest for a variety of electrical/electronic applications due to their chemical inertness, high-temperature insensitivity, very high surface area, and tunable electrical resistivity over a wide range [Kulkarni et al., Synth. Met. 159, 177 (2009)]. Because of their high porosity and associated high specific surface area, controlled surface cleaning studies are important for fabricating electronic devices from these films. In this study, quantification of surface composition and surface cleaning studies on ns-C films synthesized by carbonization of diblock copolymers of polyacrylonitrile-b-poly(n-butyl acrylate) at two different temperatures weremore » carried out. X-ray photoelectron spectroscopy was used for elemental analysis and to determine the efficacy of various surface cleaning methods for ns-C films and to examine the polymer residues in the films. The in-situ surface cleaning methods included HF vapor treatment, vacuum annealing, and exposure to UV-ozone. Quantitative analysis of high-resolution XPS scans showed 11 at. % nitrogen was present in the films pyrolyzed at 600 Degree-Sign C, suggesting incomplete denitrogenation of the copolymer films. The nitrogen atomic concentration decreased significantly for films pyrolyzed at 900 Degree-Sign C confirming extensive denitrogenation at that temperature. Furthermore, quantitative analysis of nitrogen subpeaks indicated higher loss of nitrogen atoms residing at the edge of graphitic clusters relative to that of nitrogen atoms within the graphitic clusters, suggesting higher graphitization with increasing pyrolysis temperature. Of the surface cleaning methods investigated, in-situ annealing of the films at 300 Degree-Sign C for 40 min was found to be the most efficacious in removing adventitious carbon and oxygen impurities from the surface.« less
NASA Technical Reports Server (NTRS)
Colberg, W. R.; Gordon, G. H.; Jackson, C. H.
1984-01-01
Hulls inflict minimal substrate damage. Walnut hulls found to be best abrasive for cleaning aluminum surfaces prior to painting. Samples blasted with walnut hulls showed no compressive stress of surface.
Using Ozone To Clean and Passivate Oxygen-Handling Hardware
NASA Technical Reports Server (NTRS)
Torrance, Paul; Biesinger, Paul
2009-01-01
A proposed method of cleaning, passivating, and verifying the cleanliness of oxygen-handling hardware would extend the established art of cleaning by use of ozone. As used here, "cleaning" signifies ridding all exposed surfaces of combustible (in particular, carbon-based) contaminants. The method calls for exposing the surfaces of the hardware to ozone while monitoring the ozone effluent for carbon dioxide. The ozone would passivate the hardware while oxidizing carbon-based residues, converting the carbon in them to carbon dioxide. The exposure to ozone would be continued until no more carbon dioxide was detected, signifying that cleaning and passivation were complete.
Megasonic cleaning strategy for sub-10nm photomasks
NASA Astrophysics Data System (ADS)
Hsu, Jyh-Wei; Samayoa, Martin; Dress, Peter; Dietze, Uwe; Ma, Ai-Jay; Lin, Chia-Shih; Lai, Rick; Chang, Peter; Tuo, Laurent
2016-10-01
One of the main challenges in photomask cleaning is balancing particle removal efficiency (PRE) with pattern damage control. To overcome this challenge, a high frequency megasonic cleaning strategy is implemented. Apart from megasonic frequency and power, photomask surface conditioning also influences cleaning performance. With improved wettability, cleanliness is enhanced while pattern damage risk is simultaneously reduced. Therefore, a particle removal process based on higher megasonic frequencies, combined with proper surface pre-treatment, provides improved cleanliness without the unintended side effects of pattern damage, thus supporting the extension of megasonic cleaning technology into 10nm half pitch (hp) device node and beyond.
Kusumaningrum, H D; Paltinaite, R; Koomen, A J; Hazeleger, W C; Rombouts, F M; Beumer, R R
2003-12-01
Effective cleaning and sanitizing of food preparation sites is important because pathogens are readily spread to food contact surfaces after preparation of contaminated raw products. Tolerance of Salmonella Enteritidis and Staphylococcus aureus to surface cleaning by wiping with regular, microfiber, and antibacterial-treated cloths was investigated. Wiping with cleaning cloths resulted in a considerable reduction of microorganisms from surfaces, despite the greater difficulty in removing S. aureus than Salmonella Enteritidis. Depending on the cloth type, S. aureus were reduced on surfaces from initial numbers of approximately 10(5) CFU/100 cm2 to numbers from less than 4 CFU/100 cm2 (below the detection limit) to 100 CFU/100 cm2. Directly after the cloths were used to clean the contaminated surfaces, they contained high numbers of bacteria (10(4) to 10(5) CFU/100 cm2), except for the disposable antibacterial-treated cloths, in which no bacteria could be detected. The tolerance of these pathogens to sodium hypochlorite was studied in the suspension test and in cloths. S. aureus showed a better tolerance for sodium hypochlorite than Salmonella Enteritidis. Inactivation of microorganisms in cloths required a higher concentration of sodium hypochlorite than was needed in the suspension test. Repeated exposure to sodium hypochlorite, however, resulted in an increase in susceptibility to this compound. This study provides essential information about the transfer of bacteria when wiping surfaces and highlights the need for a hygiene procedure with cleaning cloths that sufficiently avoids cross-contamination in the household environment.
Plasmas for environmental issues: from hydrogen production to 2D materials assembly
NASA Astrophysics Data System (ADS)
Tatarova, E.; Bundaleska, N.; Sarrette, J. Ph; Ferreira, C. M.
2014-12-01
It is well recognized at present that the unique, high energy density plasma environment provides suitable conditions to dissociate/atomize molecules in remediation systems, to convert waste and biomass into sustainable energy sources, to purify water, to assemble nanostructures, etc. The remarkable plasma potential is based on its ability to supply simultaneously high fluxes of charged particles, chemically active molecules, radicals (e.g. O, H, OH), heat, highly energetic photons (UV and extreme UV radiation), and strong electric fields in intrinsic sheath domains. Due to this complexity, low-temperature plasma science and engineering is a huge, highly interdisciplinary field that spans many research disciplines and applications across many areas of our daily life and industrial activities. For this reason, this review deals only with some selected aspects of low-temperature plasma applications for a clean and sustainable environment. It is not intended to be a comprehensive survey, but just to highlight some important works and achievements in specific areas. The selected issues demonstrate the diversity of plasma-based applications associated with clean and sustainable ambiance and also show the unity of the underlying science. Fundamental plasma phenomena/processes/features are the common fibers that pass across all these areas and unify all these applications. Browsing through different topics, we try to emphasize these phenomena/processes/features and their uniqueness in an attempt to build a general overview. The presented survey of recently published works demonstrates that plasma processes show a significant potential as a solution for waste/biomass-to-energy recovery problems. The reforming technologies based on non-thermal plasma treatment of hydrocarbons show promising prospects for the production of hydrogen as a future clean energy carrier. It is also shown that plasmas can provide numerous agents that influence biological activity. The simultaneous generation in water discharges of intense UV radiation, shock waves and active radicals (OH, O, H2O2, etc), which are all effective agents against many biological pathogens and harmful chemicals, make these discharges suitable for decontamination, sterilization and purification processes. Moreover, plasmas appear as invaluable tools for the synthesis and engineering of new nanomaterials and in particular 2D materials. A brief overview on plasma-synthesized carbon nanostructures shows the high potential of such materials for energy conversion and storage applications.
NASA Technical Reports Server (NTRS)
Buckley, D. H.
1979-01-01
Metal direlectric surface interactions and dielectric films on metal substrates were investigated. Since interfacial interaction depends so heavily on the nature of the surfaces, analytical surface tools such as Auger emission spectroscopy, X-ray photoelectron spectroscopy and field ion microscopy were used to assist in surface and interfacial characterization. The results indicate that with metals contacting certain glasses in the clean state interfacial, bonding produces fractures in the glasses while when a film such as water is present, fractures occur in the metal near the interface. Friction forces were used to measure the interfacial bond strengths. Studies with metals contacting polymers using field ion microscopy revealed that strong bonding forces could develop being between a metal and polymer surface with polymer transferring to the metal surface in various ways depending upon the forces applied to the surface in contact. With the deposition of refractory carbides, silicides and borides onto metal and alloy substrates the presence of oxides at the interface or active gases in the deposition plasma were shown to alter interfacial properties and chemistry. Auger ion depth profile analysis indicated the chemical composition at the interface and this could be related to the mechanical, friction, and wear behavior of the coating.
NASA Astrophysics Data System (ADS)
Salta, M.; Goodes, L. R.; Maas, B. J.; Dennington, S. P.; Secker, T. J.; Leighton, T. G.
2016-09-01
The accumulation of marine organisms on a range of manmade surfaces, termed biofouling, has proven to be the Achilles’ heel of the shipping industry. Current antifouling coatings, such as foul release coatings (FRCs), only partially inhibit biofouling, since biofilms remain a major issue. Mechanical ship hull cleaning is commonly employed to remove biofilms, but these methods tend to damage the antifouling coating and often do not result in full removal. Here, we report the effectiveness of biofilm removal from FRCs through a novel cleaning device that uses an ultrasonically activated stream (UAS). In this device, ultrasound enhances the cleaning properties of microbubbles in a freely flowing stream of water. The UAS was applied on two types of commercial FRCs which were covered with biofilm growth following twelve days immersion in the marine environment. Biofilm removal was quantified in terms of reduction in biovolume and surface roughness, both measured using an optical profilometer, which were then compared with similar measurements after cleaning with a non-ultrasonically activated water stream. It was found that the UAS significantly improves the cleaning capabilities of a water flow, up to the point where no detectable biofilm remained on the coating surfaces. Overall biofilm surface coverage was significantly lower on the FRC coatings cleaned with the UAS system when compared to the coatings cleaned with water or not cleaned at all. When biofilm biomass removal was investigated, the UAS system resulted in significantly lower biovolume values even when compared to the water cleaning treatment with biovolume values close to zero. Remarkably, the surface roughness of the coatings after cleaning with the UAS was found to be comparable to that of the blank, non-immersed coatings, illustrating that the UAS did not damage the coatings in the process. The data supporting this study are openly available from the University of Southampton repository at http://dx.doi.org/10.5258/SOTON/399420.
A numerical study on high-pressure water-spray cleaning for CSP reflectors
NASA Astrophysics Data System (ADS)
Anglani, Francesco; Barry, John; Dekkers, Willem
2016-05-01
Mirror cleaning for concentrated solar thermal (CST) systems is an important aspect of operation and maintenance (O&M), which affects solar field efficiency. The cleaning process involves soil removal by erosion, resulting from droplet impingement on the surface. Several studies have been conducted on dust accumulation and CSP plant reflectivity restoration, demonstrating that parameters such as nozzle diameter, jet impingement angle, interaxial distance between nozzles, standoff distance, water velocity, nozzle pressure and others factors influence the extent of reflectance restoration. In this paper we aim at identifying optimized cleaning strategies suitable for CST plants, able to restore mirror reflectance by high-pressure water-spray systems through the enhancement of shear stress over reflectors' surface. In order to evaluate the forces generated by water-spray jet impingement during the cleaning process, fluid dynamics simulations have been undertaken with ANSYS CFX software. In this analysis, shear forces represent the "critical phenomena" within the soil removal process. Enhancing shear forces on a particular area of the target surface, varying the angle of impingement in combination with the variation of standoff distances, and managing the interaxial distance of nozzles can increase cleaning efficiency. This procedure intends to improve the cleaning operation for CST mirrors reducing spotted surface and increasing particles removal efficiency. However, turbulence developed by adjacent flows decrease the shear stress generated on the reflectors surface. The presence of turbulence is identified by the formation of "fountain regions" which are mostly responsible of cleaning inefficiency. By numerical analysis using ANSYS CFX, we have modelled a stationary water-spray system with an array of three nozzles in line, with two angles of impingement: θ = 90° and θ = 75°. Several numerical tests have been carried out, varying the interaxial distance of nozzles, standoff distance, jet pressure and jet impingement angle in order to identify effective and efficient cleaning procedures to restore collectors' reflectance, decrease turbulence and improve CST plant efficiency. Results show that the forces generated over the flat target surface are proportional to the inlet pressure and to the water velocity over the surface, and that the shear stresses decrease as the standoff distance increases.
Bixler, Gregory D; Bhushan, Bharat
2014-01-07
In search of new solutions to complex challenges, researchers are turning to living nature for inspiration. For example, special surface characteristics of rice leaves and butterfly wings combine the shark skin (anisotropic flow leading to low drag) and lotus leaf (superhydrophobic and self-cleaning) effects, producing the so-called rice and butterfly wing effect. In this paper, we study four microstructured surfaces inspired by rice leaves and fabricated with photolithography techniques. We also present a method of creating such surfaces using a hot embossing procedure for scaled-up manufacturing. Fluid drag, self-cleaning, contact angle, and contact angle hysteresis data are presented to understand the role of sample geometrical dimensions. Conceptual modeling provides design guidance when developing novel low drag, self-cleaning, and potentially antifouling surfaces for medical, marine, and industrial applications.
Nonhazardous solvent composition and method for cleaning metal surfaces
Googin, John M.; Simandl, Ronald F.; Thompson, Lisa M.
1993-01-01
A solvent composition for displacing greasy and oily contaminants as well as water and/or aqueous residue from metallic surfaces, especially surfaces of radioactive materials so that such surfaces can be wiped clean of the displaced contaminants, water and/or aqueous residue. The solvent composition consists essentially of a blend of nonpolar aliphatic hydrocarbon solvent having a minimum flash point of about 140.degree. F. and 2 to 25 volume percent of a polar solvent having a flash point sufficiently high so as to provide the solvent composition with a minimum flash point of at least 140.degree. F. The solvent composition is nonhazardous so that when it is used to clean the surfaces of radioactive materials the waste in the form of paper or cloth wipes, lab coats and the like used in the cleaning operation is not considered to be mixed waste composed of a hazardous solvent and a radioactive material.
Nonhazardous solvent composition and method for cleaning metal surfaces
Googin, J.M.; Simandl, R.F.; Thompson, L.M.
1993-05-04
A solvent composition for displacing greasy and oily contaminants as well as water and/or aqueous residue from metallic surfaces, especially surfaces of radioactive materials so that such surfaces can be wiped clean of the displaced contaminants, water and/or aqueous residue. The solvent composition consists essentially of a blend of nonpolar aliphatic hydrocarbon solvent having a minimum flash point of about 140 F and 2 to 25 volume percent of a polar solvent having a flash point sufficiently high so as to provide the solvent composition with a minimum flash point of at least 140 F. The solvent composition is nonhazardous so that when it is used to clean the surfaces of radioactive materials the waste in the form of paper or cloth wipes, lab coats and the like used in the cleaning operation is not considered to be mixed waste composed of a hazardous solvent and a radioactive material.
Exoelectron emission from a clean, annealed magnesium single crystal during oxygen adsorption
NASA Technical Reports Server (NTRS)
Ferrante, J.
1976-01-01
Exoelectron emission was observed from a clean, annealed Mg (0001) surface during oxygen and chlorine adsorption at pressures of 6.5x10 0.00001- N/sq m and lower. the studies were performed in an ultrahigh vacuum system. The crystals were cleaned by argon ion bombardment and annealed at 300 C. Auger electron spectroscopy was used to verify surface cleanliness, and low energy electron diffraction was used to verify that the surface was annealed. The emission was found to be oxygen arrival rate dependent. Two peaks were observed in the electron emission with exposure. Evidence is presented that the formation of the second peak corresponds to oxidation of the Mg surface. No emission was observed from clean aluminum during adsorption. Results verify that electron emission occurs from a strain free surface simply upon adsorption of oxygen. A qualitative explanation for the mechanisms of emission in terms of chemical effects is presented.
NASA Astrophysics Data System (ADS)
Bixler, Gregory D.; Bhushan, Bharat
2013-12-01
In search of new solutions to complex challenges, researchers are turning to living nature for inspiration. For example, special surface characteristics of rice leaves and butterfly wings combine the shark skin (anisotropic flow leading to low drag) and lotus leaf (superhydrophobic and self-cleaning) effects, producing the so-called rice and butterfly wing effect. In this paper, we study four microstructured surfaces inspired by rice leaves and fabricated with photolithography techniques. We also present a method of creating such surfaces using a hot embossing procedure for scaled-up manufacturing. Fluid drag, self-cleaning, contact angle, and contact angle hysteresis data are presented to understand the role of sample geometrical dimensions. Conceptual modeling provides design guidance when developing novel low drag, self-cleaning, and potentially antifouling surfaces for medical, marine, and industrial applications.
METHOD OF CLEANING METAL SURFACES
Winkler, H.W.; Morfitt, J.W.; Little, T.H.
1959-05-19
Cleaning fluids for removing deposits from metal surfaces are described. The cleaning agents of the invention consist of aqueous nitric acid and an amhydrous nitrate salt of a metal which is lower in the electromotive series than the element of the deposit to be removed. In general, the salt content of thc cleaning agents ranged from 10 to 90%, preferably from 10 to 40% by weight; and the balance of the composition comprises nitric acid of any strength from extremely dilute up to concentrated strength.
Automated Array Assembly Task In-depth Study of Silicon Wafer Surface Texturizing
NASA Technical Reports Server (NTRS)
Jones, G. T.; Chitre, S.; Rhee, S. S.; Allison, K. L.
1979-01-01
A low cost wafer surface texturizing process was studied. An investigation of low cost cleaning operations to clean residual wax and organics from the surface of silicon wafers was made. The feasibility of replacing dry nitrogen with clean dry air for drying silicon wafers was examined. The two stage texturizing process was studied for the purpose of characterizing relevant parameters in large volume applications. The effect of gettering solar cells on photovoltaic energy conversion efficiency is described.
Surface Analysis Evaluation of Handwipe Cleaning for the Space Shuttle RSRM
NASA Technical Reports Server (NTRS)
Lesley, Michael W.; Anderson, Erin L.; McCool, Alex (Technical Monitor)
2001-01-01
In this paper we discuss the role of surface-sensitive spectroscopy (electron spectroscopy for chemical analysis, or ESCA) in the selection of solvents to replace 1,1,1-trichloroethane in handwipe cleaning of bonding surfaces on NASA's Space Shuttle Reusable Solid Rocket Motor (RSRM). Removal of common process soils from a wide variety of metallic and polymeric substrates was characterized. The cleaning efficiency was usually more dependent on the type of substrate being cleaned and the specific process soil than on the solvent used. A few substrates that are microscopically rough or porous proved to be difficult to clean with any cleaner, and some soils were very tenacious and difficult to remove from any substrate below detection limits. Overall, the work showed that a wide variety of solvents will perform at least as well as 1,1,1-trichloroethane.
Review of dust transport and mitigation technologies in lunar and Martian atmospheres
NASA Astrophysics Data System (ADS)
Afshar-Mohajer, Nima; Wu, Chang-Yu; Curtis, Jennifer Sinclair; Gaier, James R.
2015-09-01
Dust resuspension and deposition is a ubiquitous phenomenon in all lunar and Martian missions. The near-term plans to return to the Moon as a stepping stone to further exploration of Mars and beyond bring scientists' attention to development and evaluation of lunar and Martian dust mitigation technologies. In this paper, different lunar and Martian dust transport mechanisms are presented, followed by a review of previously developed dust mitigation technologies including fluidal, mechanical, electrical and passive self-cleaning methods for lunar/Martian installed surfaces along with filtration for dust control inside cabins. Key factors in choosing the most effective dust mitigation technology are recognized to be the dust transport mechanism, energy consumption, environment, type of surface materials, area of the surface and surface functionality. While electrical methods operating at higher voltages are identified to be suitable for small but light sensitive surfaces, pre-treatment of the surface is effective for cleaning thermal control surfaces, and mechanical methods are appropriate for surfaces with no concerns of light blockage, surface abrasion and 100% cleaning efficiency. Findings from this paper can help choose proper surface protection/cleaning for future space explorations. Hybrid techniques combining the advantages of different methods are recommended.
Cleaning techniques for applied-B ion diodes
DOE Office of Scientific and Technical Information (OSTI.GOV)
Cuneo, M.E.; Menge, P.R.; Hanson, D.L.
Measurements and theoretical considerations indicate that the lithium-fluoride (LiF) lithium ion source operates by electron-assisted field-desorption, and provides a pure lithium beam for 10--20 ns. Evidence on both the SABRE (1 TW) and PBFA-II (20 TW) accelerators indicates that the lithium beam is replaced by a beam of protons, and carbon resulting from electron thermal desorption of hydrocarbon surface and bulk contamination with subsequent avalanche ionization. Appearance of contaminant ions in the beam is accompanied by rapid impedance collapse, possibly resulting from loss of magnetic insulation in the rapidly expanding and ionizing, neutral layer. Electrode surface and source substrate cleaningmore » techniques are being developed on the SABRE accelerator to reduce beam contamination, plasma formation, and impedance collapse. We have increased lithium current density a factor of 3 and lithium energy a factor of 5 through a combination of in-situ surface and substrate coatings, impermeable substrate coatings, and field profile modifications.« less
An evaluation of the efficiency of cleaning methods in a bacon factory
Dempster, J. F.
1971-01-01
The germicidal efficiencies of hot water (140-150° F.) under pressure (method 1), hot water + 2% (w/v) detergent solution (method 2) and hot water + detergent + 200 p.p.m. solution of available chlorine (method 3) were compared at six sites in a bacon factory. Results indicated that sites 1 and 2 (tiled walls) were satisfactorily cleaned by each method. It was therefore considered more economical to clean such surfaces routinely by method 1. However, this method was much less efficient (31% survival of micro-organisms) on site 3 (wooden surface) than methods 2 (7% survival) and 3 (1% survival). Likewise the remaining sites (dehairing machine, black scraper and table) were least efficiently cleaned by method 1. The most satisfactory results were obtained when these surfaces were treated by method 3. Pig carcasses were shown to be contaminated by an improperly cleaned black scraper. Repeated cleaning and sterilizing (method 3) of this equipment reduced the contamination on carcasses from about 70% to less than 10%. PMID:5291745
NASA Astrophysics Data System (ADS)
Nieroda, Jolanta; Rybak, Andrzej; Kmita, Grzegorz; Sitarz, Maciej
2018-05-01
Metallic glasses are metallic materials, which exhibit an amorphous structure. These are mostly three or more component alloys, and some of them are magnetic metals. Materials of this kind are characterized by high electrical resistivity and at the same time exhibit very good magnetic properties (e.g. low-magnetization loss). The above mentioned properties are very useful in electrical engineering industry and this material is more and more popular as a substance for high-efficiency electrical devices production. This industry area is still evolving, and thus even higher efficiency of apparatus based on amorphous material is expected. A raw material must be carefully investigated and characterized before the main production process is started. Presented work contains results of complementary examination of amorphous metal Metglas 2605. Studies involve two ways to obtain clean and oxidized surface with high reactivity, namely degreasing followed by annealing process and plasma treatment. The amorphous metal parameters were examined by means of several techniques: surface free energy (SFE) measurements by sessile drop method, X-ray Photoelectron Spectroscopy (XPS), Scanning Electron Microscopy (SEM), X-ray Diffraction (XRD), and both ex situ and in situ Raman spectroscopy. Additionally, influence of plasma parameters on wetting properties were optimized in systematic way with Design of Experiments (DOE) method. A wide range of used methods allow to fully investigate the amorphous metal material during preliminary preparation of surface. Obtained results provide information about appropriate parameters that should be applied in order to obtain highly reactive surface with functional oxide layer on it.
Visualization of flow during cleaning process on a liquid nanofibrous filter
NASA Astrophysics Data System (ADS)
Bílek, P.
2017-10-01
This paper deals with visualization of flow during cleaning process on a nanofibrous filter. Cleaning of a filter is very important part of the filtration process which extends lifetime of the filter and improve filtration properties. Cleaning is carried out on flat-sheet filters, where particles are deposited on the filter surface and form a filtration cake. The cleaning process dislodges the deposited filtration cake, which is loose from the membrane surface to the retentate flow. The blocked pores in the filter are opened again and hydrodynamic properties are restored. The presented optical method enables to see flow behaviour in a thin laser sheet on the inlet side of a tested filter during the cleaning process. The local concentration of solid particles is possible to estimate and achieve new information about the cleaning process. In the article is described the cleaning process on nanofibrous membranes for waste water treatment. The hydrodynamic data were compared to the images of the cleaning process.
Cleaning, disinfection and sterilization of surface prion contamination.
McDonnell, G; Dehen, C; Perrin, A; Thomas, V; Igel-Egalon, A; Burke, P A; Deslys, J P; Comoy, E
2013-12-01
Prion contamination is a risk during device reprocessing, being difficult to remove and inactivate. Little is known of the combined effects of cleaning, disinfection and sterilization during a typical reprocessing cycle in clinical practice. To investigate the combination of cleaning, disinfection and/or sterilization on reducing the risk of surface prion contamination. In vivo test methods were used to study the impact of cleaning alone and cleaning combined with thermal disinfection and high- or low-temperature sterilization processes. A standardized test method, based on contamination of stainless steel wires with high titres of scrapie-infected brain homogenates, was used to determine infectivity reduction. Traditional chemical methods of surface decontamination against prions were confirmed to be effective, but extended steam sterilization was more variable. Steam sterilization alone reduced the risk of prion contamination under normal or extended exposure conditions, but did show significant variation. Thermal disinfection had no impact in these studies. Cleaning with certain defined formulations in combination with steam sterilization can be an effective prion decontamination process, in particular with alkaline formulations. Low-temperature, gaseous hydrogen peroxide sterilization was also confirmed to reduce infectivity in the presence and absence of cleaning. Prion decontamination is affected by the full reprocessing cycle used on contaminated surfaces. The correct use of defined cleaning, disinfection and sterilization methods as tested in this report in the scrapie infectivity assay can provide a standard precaution against prion contamination. Copyright © 2013 The Healthcare Infection Society. Published by Elsevier Ltd. All rights reserved.
Hot spots and dark current in advanced plasma wakefield accelerators
Manahan, G. G.; Deng, A.; Karger, O.; ...
2016-01-29
Dark current can spoil witness bunch beam quality and acceleration efficiency in particle beam-driven plasma wakefield accelerators. In advanced schemes, hot spots generated by the drive beam or the wakefield can release electrons from higher ionization threshold levels in the plasma media. Likewise, these electrons may be trapped inside the plasma wake and will then accumulate dark current, which is generally detrimental for a clear and unspoiled plasma acceleration process. The strategies for generating clean and robust, dark current free plasma wake cavities are devised and analyzed, and crucial aspects for experimental realization of such optimized scenarios are discussed.
Overlap junctions for high coherence superconducting qubits
NASA Astrophysics Data System (ADS)
Wu, X.; Long, J. L.; Ku, H. S.; Lake, R. E.; Bal, M.; Pappas, D. P.
2017-07-01
Fabrication of sub-micron Josephson junctions is demonstrated using standard processing techniques for high-coherence, superconducting qubits. These junctions are made in two separate lithography steps with normal-angle evaporation. Most significantly, this work demonstrates that it is possible to achieve high coherence with junctions formed on aluminum surfaces cleaned in situ by Ar plasma before junction oxidation. This method eliminates the angle-dependent shadow masks typically used for small junctions. Therefore, this is conducive to the implementation of typical methods for improving margins and yield using conventional CMOS processing. The current method uses electron-beam lithography and an additive process to define the top and bottom electrodes. Extension of this work to optical lithography and subtractive processes is discussed.
Supersonic Gas-Liquid Cleaning System
NASA Technical Reports Server (NTRS)
Kinney, Frank
1996-01-01
The Supersonic Gas-Liquid Cleaning System Research Project consisted mainly of a feasibility study, including theoretical and engineering analysis, of a proof-of-concept prototype of this particular cleaning system developed by NASA-KSC. The cleaning system utilizes gas-liquid supersonic nozzles to generate high impingement velocities at the surface of the device to be cleaned. The cleaning fluid being accelerated to these high velocities may consist of any solvent or liquid, including water. Compressed air or any inert gas is used to provide the conveying medium for the liquid, as well as substantially reduce the total amount of liquid needed to perform adequate surface cleaning and cleanliness verification. This type of aqueous cleaning system is considered to be an excellent way of conducting cleaning and cleanliness verification operations as replacements for the use of CFC 113 which must be discontinued by 1995. To utilize this particular cleaning system in various cleaning applications for both the Space Program and the commercial market, it is essential that the cleaning system, especially the supersonic nozzle, be characterized for such applications. This characterization consisted of performing theoretical and engineering analysis, identifying desirable modifications/extensions to the basic concept, evaluating effects of variations in operating parameters, and optimizing hardware design for specific applications.
[Evaluation of Medical Instruments Cleaning Effect of Fluorescence Detection Technique].
Sheng, Nan; Shen, Yue; Li, Zhen; Li, Huijuan; Zhou, Chaoqun
2016-01-01
To compare the cleaning effect of automatic cleaning machine and manual cleaning on coupling type surgical instruments. A total of 32 cleaned medical instruments were randomly sampled from medical institutions in Putuo District medical institutions disinfection supply center. Hygiena System SUREII ATP was used to monitor the ATP value, and the cleaning effect was evaluated. The surface ATP values of the medical instrument of manual cleaning were higher than that of the automatic cleaning machine. Coupling type surgical instruments has better cleaning effect of automatic cleaning machine before disinfection, the application is recommended.
Metal sponge for cryosorption pumping applications
Myneni, Ganapati R.; Kneisel, Peter
1995-01-01
A system has been developed for adsorbing gases at high vacuum in a closed area. The system utilizes large surface clean anodized metal surfaces at low temperatures to adsorb the gases. The large surface clean anodized metal is referred to as a metal sponge. The metal sponge generates or maintains the high vacuum by increasing the available active cryosorbing surface area.
Theoretical considerations of soil retention. [dirtying of solar energy devices
NASA Technical Reports Server (NTRS)
Cuddihy, E. F.
1980-01-01
The performance of solar energy devices is adversely affected by surface soiling, and generally, the loss of performance increases with increases in the quantity of soil retained on their surfaces. To minimize performance losses caused by soiling, solar devices should not only be deployed in low soiling geographical areas, but employ surfaces or surfacing materials having low affinity for soil retention, maximum susceptibility to be naturally cleaned by wind, rain and snow, and to be readily cleanable by simple and inexpensive maintenance cleaning techniques. This article describes known and postulated mechanisms of soil retention on surfaces, and infers from these mechanisms that low soiling and easily cleanable surfaces should have low surface energy, and be hard, smooth, hydrophobic and chemically clean of sticky materials and water soluble salts.
Carbon Nanotube Bonding Strength Enhancement Using Metal "Wicking" Process
NASA Technical Reports Server (NTRS)
Lamb, James L.; Dickie, Matthew R.; Kowalczyk, Robert S.; Liao, Anna; Bronikowski, Michael J.
2012-01-01
Carbon nanotubes grown from a surface typically have poor bonding strength at the interface. A process has been developed for adding a metal coat to the surface of carbon nano tubes (CNTs) through a wicking process, which could lead to an enhanced bonding strength at the interface. This process involves merging CNTs with indium as a bump-bonding enhancement. Classical capillary theory would not normally allow materials that do not wet carbon or graphite to be drawn into the spacings by capillary action because the contact angle is greater than 90 degrees. However, capillary action can be induced through JPL's ability to fabricate oriented CNT bundles to desired spacings, and through the use of deposition techniques and temperature to control the size and mobility of the liquid metal streams and associated reservoirs. A reflow and plasma cleaning process has also been developed and demonstrated to remove indium oxide, and to obtain smooth coatings on the CNT bundles.
Cleaning a Martian Meteoritean Meteorite
2018-02-13
A slice of a meteorite scientists have determined came from Mars placed inside an oxygen plasma cleaner, which removes organics from the outside of surfaces. This slice will likely be used here on Earth for testing a laser instrument for NASA's Mars 2020 rover; a separate slice will go to Mars on the rover. Martian meteorites are believed to be the result of impacts to the Red Planet's surface, resulting in rock being blasted into the atmosphere. After traveling through space for eons, some of these rocks entered Earth's atmosphere. Scientists determine whether they are true Martian meteorites based on their rock and noble gas chemistry and mineralogy. The gases trapped in these meteorites bear the unique fingerprint of the Martian atmosphere, as recorded by NASA's Viking mission in 1976. The rock types also show clear signs of igneous processing not possible on smaller bodies, such as asteroids. https://photojournal.jpl.nasa.gov/catalog/PIA22247
Microstructure of rapidly solidified Nb-based pre-alloyed powders for additive manufacturing
NASA Astrophysics Data System (ADS)
Guo, Yueling; Jia, Lina; Kong, Bin; Zhang, Shengnan; Zhang, Fengxiang; Zhang, Hu
2017-07-01
For powder-based additive manufacturing, sphere-shaped Nb-37Ti-13Cr-2Al-1Si pre-alloyed powders were prepared by plasma rotating electrode processing (PREP). The microstructure, surface oxidation and microhardness of the pre-alloyed powders were systematically investigated. Results showed that the main phases were Nb solid solution (Nbss) and Cr2Nb. The Cr2Nb phases were further determined using transmission electron microscopy (TEM). Fine dendrite structures were observed in the as-fabricated pre-alloyed powders, which transformed to large grains after heat treatment (HT) at 1450 °C for 3 h. With the increase of powder size, the secondary dendrite arm spacing (SDAS) increased and the microhardness (HV) decreased. A clean powder surface free of oxide particles was obtained by PREP and an oxide layer with 9.39 nm in thickness was generated on the powder surface. Compared with Cr- and Nb-oxides, more Ti-oxides were formed on outmost powder surface with a higher content of Ti (up to 47.86 at.%). The differences upon the microstructure and microhardness of the pre-alloyed powders with different sizes were discussed.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Jadeja, K.A.; Patel, K.M.; Tanna, R.L., E-mail: kumarpal@ipr.res.in
Low temperature glow discharge wall conditioning (GDC) using H{sub 2} gas is effective in reduction of oxygen and carbon (low-Z) contain impurities on near surface region of vessel wall. The high retention of hydrogen in vessel wall/components due to long operation of H{sub 2} GDC increases hydrogen out-gassing during tokamak operation and affects the production of high temperature plasma. The hydrogen retention can be reduced using inert gas GDC by sputter cleaning for short duration. But in that case the out-gassing rate of inert gas increases, that again impairs the plasma performance. To overcome above problems, the GDC with hydrogen-inertmore » gas mixture can be used for better removal of C and O surface contaminants and low hydrogen retention in surface. In ADITYA tokamak, H{sub 2}-GDC is carried out regularly after plasma operation, while the GDC with argon-hydrogen (Ar-H{sub 2}) mixture has been experimentally tested to observe the reduction of oxygen and carbon impurities along with low hydrogen retention. In Ar-H{sub 2} GDC, the reason being the formation of ArH{sup +} hydride ions, which has quite long life and more energy compared to H{sub 2}{sup +} ions formed in H{sub 2} GDC for breaking the bond of wall molecules. A systematic comparative study of H{sub 2} GDC and Ar-H{sub 2} Mixture GDC by changing the mixture ratio has been carried out in ADITYA tokamak. The relative levels of oxygen and carbon contain impurities have been measured using residual gas analyzer in both GDC's. We have observed a substantial reduction in oxygen and carbon impurities with a significant improvement in wall condition with Ar-H{sub 2} GDC compared to the H{sub 2} GDC. The effect of wall conditioning by Ar-H{sub 2} GDC on the performance of high temperature plasma operation will be presented in this paper. (author)« less
Hora, H.; Korn, G.; Eliezer, S.; ...
2016-10-11
Measured highly elevated gains of proton–boron (HB11) fusion (Picciottoet al., Phys. Rev. X4, 031030 (2014)) confirmed the exceptional avalanche reaction process (Lalousiset al., Laser Part. Beams 32, 409 (2014); Horaet al., Laser Part. Beams33, 607 (2015)) for the combination of the non-thermal block ignition using ultrahigh intensity laser pulses of picoseconds duration. The ultrahigh accelerationabovemore » $$10^{20}~\\text{cm}~\\text{s}^{-2}$$ for plasma blocks was theoretically and numerically predicted since 1978 (Hora,Physics of Laser Driven Plasmas(Wiley, 1981), pp. 178 and 179) and measured (Sauerbrey, Phys. Plasmas3, 4712 (1996)) in exact agreement (Horaet al., Phys. Plasmas14, 072701 (2007)) when the dominating force was overcoming thermal processes. This is based on Maxwell’s stress tensor by the dielectric properties of plasma leading to the nonlinear (ponderomotive) force $$f_{\\text{NL}}$$ resulting in ultra-fast expanding plasma blocks by a dielectric explosion. Combining this with measured ultrahigh magnetic fields and the avalanche process opens an option for an environmentally absolute clean and economic boron fusion power reactor. Finally, this is supported also by other experiments with very high HB11 reactions under different conditions (Labauneet al., Nature Commun.4, 2506 (2013)).« less
Detecting Fermi-level shifts by Auger electron spectroscopy in Si and GaAs
NASA Astrophysics Data System (ADS)
Debehets, J.; Homm, P.; Menghini, M.; Chambers, S. A.; Marchiori, C.; Heyns, M.; Locquet, J. P.; Seo, J. W.
2018-05-01
In this paper, changes in surface Fermi-level of Si and GaAs, caused by doping and cleaning, are investigated by Auger electron spectroscopy. Based on the Auger voltage contrast, we compared the Auger transition peak energy but with higher accuracy by using a more accurate analyzer and an improved peak position determination method. For silicon, a peak shift as large as 0.46 eV was detected when comparing a cleaned p-type and n-type wafer, which corresponds rather well with the theoretical difference in Fermi-levels. If no cleaning was applied, the peak position did not differ significantly for both wafer types, indicating Fermi-level pinning in the band gap. For GaAs, peak shifts were detected after cleaning with HF and (NH4)2S-solutions in an inert atmosphere (N2-gas). Although the (NH4)2S-cleaning in N2 is very efficient in removing the oxygen from the surface, the observed Ga- and As-peak shifts are smaller than those obtained after the HF-cleaning. It is shown that the magnitude of the shift is related to the surface composition. After Si-deposition on the (NH4)2S-cleaned surface, the Fermi-level shifts back to a similar position as observed for an as-received wafer, indicating that this combination is not successful in unpinning the Fermi-level of GaAs.
NASA Technical Reports Server (NTRS)
Schmeling, M.; Burnett, D. S.; Allton, J. H.; Rodriquez, M.; Tripa, C. E.; Veryovkin, I. V.
2013-01-01
The Genesis mission was the first mission returning solar material to Earth since the Apollo program [1,2]. Unfortunately the return of the space craft on September 8, 2004 resulted in a crash landing, which shattered the samples into small fragments and exposed them to desert soil and other debris. Thus only small fragments of the original collectors are available, each having different degrees of surface contamination. Thorough surface cleaning is required to allow for subsequent analysis of solar wind material embedded within. An initial cleaning procedure was developed in coordination with Johnson Space Center which focused on removing larger sized particulates and a thin film organic contamination acquired during collection in space [3]. However, many of the samples have additional residues and more rigorous and/or innovative cleaning steps might be necessary. These cleaning steps must affect only the surface to avoid leaching and re-distribution of solar wind material from the bulk of the collectors. To aid in development and identification of the most appropriate cleaning procedures each sample has to be thoroughly inspected before and after each cleaning step. Laboratory based total reflection X-ray fluorescence (TXRF) spectrometry lends itself to this task as it is a non-destructive and surface sensitive analytical method permitting analysis of elements from aluminum onward present at and near the surface of a flat substrate [4]. The suitability of TXRF has been demonstrated for several Genesis solar wind samples before and after various cleaning methods including acid treatment, gas cluster ion beam, and CO2 snow jet [5 - 7]. The latter one is non-invasive and did show some promise on one sample [5]. To investigate the feasibility of CO2 snow jet cleaning further, several flown Genesis samples were selected to be characterized before and after CO2 snow application with sample 61052 being discussed below.
Experimental investigation on cleaning of corroded ancient coins using a Nd:YAG laser
NASA Astrophysics Data System (ADS)
Zhu, Huazhong; Lu, Jian; Ni, Xiaowu; Shen, Zhonghua
2017-05-01
The objective of the work reported is to study experimentally on the removal of corrosion layer from the ancient coins using laser beam as the conservation tool. With the use of Q-switched Nd:YAG laser radiation at 1064 nm, dry laser cleaning, steam laser cleaning and chemical-assisted laser cleaning were used to find out a more suitable and efficient laser treatment for corrosion removal. Cleaning tests were performed on ancient Chinese coins. Experimental results shows that the dry laser cleaning was not successful at removing all types of corrosion crust. It was possible to remove the outer thicker layer of the corrosion products (typically known as patina), but failed on the thinner layer of cuprite. The steam laser cleaning could decrease the initial removal threshold and improve the removal efficiency especially for the oxidation with powdery structure. As for chemical-assisted laser treatment, the cleaning results demonstrate that the combination of laser and chemical reagent could provide a considerable improvement in corrosion removal compared with the conventional laser treatments. Most of the corrosion contaminant was stripped, even the cuprite layer. Moreover, no secondary pollution was formed on the cleaned surface. X-ray fluorescence was applied to determine the variation of composition of surface layer and bulk metal before and after the coins cleaned. It shows that all of the three laser treatments were efficient to reduce the chlorine concentration on the surface of the coins more than 75%.
Plasma Radiofrequency Discharges as Cleaning Technique for the Removal of C-W Coatings
NASA Astrophysics Data System (ADS)
Cremona, A.; Vassallo, E.; Caniello, R.; Ghezzi, F.; Grosso, G.; Laguardia, L.
2013-06-01
Erosion of materials by chemical and physical sputtering is one of the most concern of plasma wall interaction in tokamaks. In divertor ITER-like tokamaks, where carbon and tungsten are planned to be used, hydrogenated C-W mixed compounds are expected to form by erosion, transport and re-deposition processes. The selection of these materials as divertor components involves lifetime and safety issues due to tritium retention in carbon co-deposits. In this paper a cleaning technique based on RF (13.56 MHz) capacitively coupled H2/Ar plasmas has been used to remove C-W mixed materials from test specimens. The dependence of the removal rate on the H2/Ar ratio and on the plasma pressure has been investigated by X-ray photoelectron spectroscopy, atomic force microscopy, profilometry as regards the solid phase and by Langmuir probe and optical emission spectroscopy as regards the plasma phase. The best result has been obtained with a H2/Ar ratio of 10/90 at a pressure of 1 Pa. An explanation based on a synergistic effect between physical sputtering due to energetic ions and chemical etching due to radicals, together with the pressure dependence of the ion energy distribution function, is given.
Adventitious Carbon on Primary Sample Containment Metal Surfaces
NASA Technical Reports Server (NTRS)
Calaway, M. J.; Fries, M. D.
2015-01-01
Future missions that return astromaterials with trace carbonaceous signatures will require strict protocols for reducing and controlling terrestrial carbon contamination. Adventitious carbon (AC) on primary sample containers and related hardware is an important source of that contamination. AC is a thin film layer or heterogeneously dispersed carbonaceous material that naturally accrues from the environment on the surface of atmospheric exposed metal parts. To test basic cleaning techniques for AC control, metal surfaces commonly used for flight hardware and curating astromaterials at JSC were cleaned using a basic cleaning protocol and characterized for AC residue. Two electropolished stainless steel 316L (SS- 316L) and two Al 6061 (Al-6061) test coupons (2.5 cm diameter by 0.3 cm thick) were subjected to precision cleaning in the JSC Genesis ISO class 4 cleanroom Precision Cleaning Laboratory. Afterwards, the samples were analyzed by X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy.
NASA Astrophysics Data System (ADS)
Baohong, Gao; Yuling, Liu; Chenwei, Wang; Yadong, Zhu; Shengli, Wang; Qiang, Zhou; Baimei, Tan
2010-10-01
This paper presents a new cleaning process using boron-doped diamond (BDD) film anode electrochemical oxidation for metallic contaminants on polished silicon wafer surfaces. The BDD film anode electrochemical oxidation can efficiently prepare pyrophosphate peroxide, pyrophosphate peroxide can oxidize organic contaminants, and pyrophosphate peroxide is deoxidized into pyrophosphate. Pyrophosphate, a good complexing agent, can form a metal complex, which is a structure consisting of a copper ion, bonded to a surrounding array of two pyrophosphate anions. Three polished wafers were immersed in the 0.01 mol/L CuSO4 solution for 2 h in order to make comparative experiments. The first one was cleaned by pyrophosphate peroxide, the second by RCA (Radio Corporation of America) cleaning, and the third by deionized (DI) water. The XPS measurement result shows that the metallic contaminants on wafers cleaned by the RCA method and by pyrophosphate peroxide is less than the XPS detection limits of 1 ppm. And the wafer's surface cleaned by pyrophosphate peroxide is more efficient in removing organic carbon residues than RCA cleaning. Therefore, BDD film anode electrochemical oxidation can be used for microelectronics cleaning, and it can effectively remove organic contaminants and metallic contaminants in one step. It also achieves energy saving and environmental protection.
Assessment of hospital daily cleaning practices using ATP bioluminescence in a developing country.
Zambrano, Alejandra A; Jones, Alex; Otero, Paula; Ajenjo, Maria Cristina; Labarca, Jaime A
2014-01-01
Visual assessment of surfaces may not be enough to document the level of cleanliness in the hospital setting. It is necessary to introduce quantitative methods to document the results of this practice. To evaluate the efficacy of hospital terminal cleaning procedures, using an adenosine triphosphate (ATP) bioluminescence method in a teaching hospital. During 2008 we conducted an evaluation using ATP bioluminescence LIGHTNING MVP™ (Arquimed) of external and internal housekeeping service. After conducting an initial evaluation we implemented education of cleaning practices and finally we did a post intervention evaluation. Using chi-square method we compared prior versus after cleaning, quality of cleaning performed by external versus internal personnel, single versus double terminal cleaning procedures and prior versus after intervention. A finding of three RLU or less was considered a clean surface. We performed 198 evaluations in 33 patient units and nine OR. Internal personnel accomplished 25.37% of clean surfaces before and 80% after the education intervention (p=0.01). In contrast, external personnel obtained 68.8% before and 73.33% after intervention (p=0.3). This study suggests that visual assessment is not enough to ensure quality of the process and it is necessary to document the level of cleanliness by quantitative methods. Copyright © 2014 Elsevier Editora Ltda. All rights reserved.
NASA Astrophysics Data System (ADS)
Mirnov, S. V.; Azizov, E. A.; Evtikhin, V. A.; Lazarev, V. B.; Lyublinski, I. E.; Vertkov, A. V.; Prokhorov, D. Yu
2006-06-01
The paper is an overview of recent results of Li limiter testing in T-11M tokamak. The lithium limiter is based on the capillary-pore system (CPS) concept. The Li erosion process and deuterium (D2) and helium (He) sorption by Li first wall were investigated. The ability of capillary forces to confine the liquid Li in the CPS limiter during disruption was demonstrated. The idea of combined lithium limiter with thin (0.6 mm) CPS coating as a solution of the heat removal problem was realized. As a result the quasi steady-state tokamak regime with duration up to 0.3 s and clean (Zeff = 1) deuterium plasma has been achieved. The temporal evolution of the lithium surface temperature during discharge was measured by a IR radiometer and then was recalculated to the surface power load. For the estimation of the Li limiter erosion the Li neutral and ions spectral line emission were observed. The increase in lithium erosion as a result of limiter heating was discovered. The radial distribution of plasma column radiation measurements showed up to 90% of the total radiation losses in a relatively thin (5 cm) boundary layer and only 10% in a plasma centre during discharges with high Li influx. Oscillations of Li emission and saw-tooth-like oscillations of the limiter surface temperature have been detected in discharge regimes with highest Li limiter temperature (>600 °C). A version of Li CPS first wall of DEMO reactor and Li CPS limiter experiment in the International Thermonuclear Energy Reactor are suggested.
Assessment of terminal cleaning in pediatric isolation rooms: Options for low-resource settings.
Dramowski, Angela; Whitelaw, Andrew; Cotton, Mark F
2016-12-01
Few studies have evaluated terminal cleaning in low-resource settings. Adequacy of pediatric isolation room terminal cleaning was evaluated using quantitative bacterial surface cultures, ATP bioluminescence assays, and fluorescent high-touch surface markers at Tygerberg Children's Hospital in South Africa (August 1, 2014-October 31, 2015). Cleaning adequacy was assessed by comparing pre- and postcleaning measurements. Influence of verbal feedback was determined by comparing cleaners' first and subsequent cleaning episodes. Cleaning methods were compared for cost, time, and feasibility. Adequacy of terminal cleaning was evaluated in 25 isolation rooms after hospitalization for pulmonary tuberculosis (n = 13), respiratory (n = 5) and enteric viruses (n = 5), pertussis (n = 1), and methicillin-resistant Staphylococcus aureus (n = 1). Mean aerobic colony counts and mean ATP relative light units declined between pre- and postcleaning evaluations (39 ± 41 to 15 ± 30 [P < .001] and 72 ± 40 to 23 ± 11 [P < .001]). Fluorescent marker removal was initially poor, but improved significantly at subsequent cleaning episodes (17 out of 78 [22%] to 121 out of 198 [61%]; P < .001); mean aerobic colony counts and ATP values also declined significantly following feedback. Cost, time, and resources required for ATP and surface cultures far exceeded that required for fluorescent markers. Adequacy of isolation room cleaning improved following feedback to cleaning staff. Fluorescent markers are an inexpensive option for cleaning evaluation and training in low-resource settings. Copyright © 2016 Association for Professionals in Infection Control and Epidemiology, Inc. Published by Elsevier Inc. All rights reserved.
Clean Air Markets - Monitoring Surface Water Chemistry
Learn about how EPA uses Long Term Monitoring (LTM) and Temporily Integrated Monitoring of Ecosystems (TIME) to track the effect of the Clean Air Act Amendments on acidity of surface waters in the eastern U.S.
A method for preparation and cleaning of uniformly sized arsenopyrite particles
DOE Office of Scientific and Technical Information (OSTI.GOV)
Parthasarathy, Hariprasad; Baltrus, John P; Dzombak, David A
The oxidative dissolution of sulfide minerals, such as arsenopyrite (FeAsS), is of critical importance in many geochemical systems. A comprehensive understanding of their dissolution rates entails careful preparation of the mineral surface. Measurements of dissolution rates of arsenic from arsenopyrite are dependent on the size and degree of oxidation of its particles, among other factors. In this work, a method was developed for preparation and cleaning of arsenopyrite particles with size range of 150–250 μm. Four different cleaning methods were evaluated for effectiveness based on the removal of oxidized species of iron (Fe), arsenic (As) and sulfur (S) from themore » surface. The percentage oxidation of the surface was determined using X-ray photoelectron spectroscopy (XPS), and surface stoichiometry was measured using scanning electron microscopy – energy dispersive X-ray spectroscopy (SEM-EDS). Results indicate that sonicating the arsenopyrite particles and then cleaning them with 12N HCl followed by 50% ethanol, and drying in nitrogen was the most effective method. This method was successful in greatly reducing the oxide species of Fe while completely removing oxides of As and S from the arsenopyrite surface. Although sonication and acid cleaning have been widely used for mineral preparation, the method described in this study can significantly reduce grain size heterogeneity as well as surface oxidation, which enables greater control in surface and dissolution experiments.« less
A method for preparation and cleaning of uniformly sized arsenopyrite particles
Parthasarathy, Hariprasad; Baltrus, John P; Dzombak, David A; ...
2014-10-11
The oxidative dissolution of sulfide minerals, such as arsenopyrite (FeAsS), is of critical importance in many geochemical systems. A comprehensive understanding of their dissolution rates entails careful preparation of the mineral surface. Measurements of dissolution rates of arsenic from arsenopyrite are dependent on the size and degree of oxidation of its particles, among other factors. In this work, a method was developed for preparation and cleaning of arsenopyrite particles with size range of 150–250 μm. Four different cleaning methods were evaluated for effectiveness based on the removal of oxidized species of iron (Fe), arsenic (As) and sulfur (S) from themore » surface. The percentage oxidation of the surface was determined using X-ray photoelectron spectroscopy (XPS), and surface stoichiometry was measured using scanning electron microscopy – energy dispersive X-ray spectroscopy (SEM-EDS). Results indicate that sonicating the arsenopyrite particles and then cleaning them with 12N HCl followed by 50% ethanol, and drying in nitrogen was the most effective method. This method was successful in greatly reducing the oxide species of Fe while completely removing oxides of As and S from the arsenopyrite surface. Although sonication and acid cleaning have been widely used for mineral preparation, the method described in this study can significantly reduce grain size heterogeneity as well as surface oxidation, which enables greater control in surface and dissolution experiments.« less
Sugiyama, Toshiko; Kameyama, Atsushi; Enokuchi, Tomoka; Haruyama, Akiko; Chiba, Aoi; Sugiyama, Setsuko; Hosaka, Makoto; Takahashi, Toshiyuki
2017-06-01
This study aimed to evaluate the effect of dental prophylaxis on the surface gloss and roughness of different indirect restorative materials for computer-aided design/computer-aided manufacturing (CAD/CAM): two types of CAD/CAM composite resin blocks (Shofu Block HC and Estelite Block) and two types of CAD/CAM ceramic blocks (IPS Empress CAD and Celtra DUO). After polishing the CAD/CAM blocks and applying prophylaxis pastes, professional dental prophylaxis was performed using four different experimental protocols (n = 5 each): mechanical cleaning with Merssage Regular for 10 s four times (Group 1); four cycles of mechanical cleaning with Merssage Regular for 10 s and Merssage Fine for 10 s (Group 2); four cycles of mechanical cleaning with Merssage Regular for 10 s and Merssage Fine for 30 s (Group 3); and mechanical cleaning with Merssage Fine for 10 s four times (Group 4). A glossmeter was used to measure surface gloss before and after mechanical cleaning, and a contact stylus profilometer was used to measure surface roughness (Ra). Polishing with prophylactic paste led to a significant reduction in surface gloss and increase in surface roughness among resin composite blocks, whereas the polishing-related change in surface gloss or roughness was smaller in Celtra DUO, a zirconia-reinforced lithium silicate block. Changes in surface gloss and roughness due to polishing with a prophylactic paste containing large particles were not improved by subsequent polishing with a prophylactic paste containing fine particles. Key words: CAD/CAM, professional dental prophylaxis, prophylactic paste, surface gloss, surface roughness.
Sugiyama, Toshiko; Enokuchi, Tomoka; Haruyama, Akiko; Chiba, Aoi; Sugiyama, Setsuko; Hosaka, Makoto; Takahashi, Toshiyuki
2017-01-01
Background This study aimed to evaluate the effect of dental prophylaxis on the surface gloss and roughness of different indirect restorative materials for computer-aided design/computer-aided manufacturing (CAD/CAM): two types of CAD/CAM composite resin blocks (Shofu Block HC and Estelite Block) and two types of CAD/CAM ceramic blocks (IPS Empress CAD and Celtra DUO). Material and Methods After polishing the CAD/CAM blocks and applying prophylaxis pastes, professional dental prophylaxis was performed using four different experimental protocols (n = 5 each): mechanical cleaning with Merssage Regular for 10 s four times (Group 1); four cycles of mechanical cleaning with Merssage Regular for 10 s and Merssage Fine for 10 s (Group 2); four cycles of mechanical cleaning with Merssage Regular for 10 s and Merssage Fine for 30 s (Group 3); and mechanical cleaning with Merssage Fine for 10 s four times (Group 4). A glossmeter was used to measure surface gloss before and after mechanical cleaning, and a contact stylus profilometer was used to measure surface roughness (Ra). Results Polishing with prophylactic paste led to a significant reduction in surface gloss and increase in surface roughness among resin composite blocks, whereas the polishing-related change in surface gloss or roughness was smaller in Celtra DUO, a zirconia-reinforced lithium silicate block. Conclusions Changes in surface gloss and roughness due to polishing with a prophylactic paste containing large particles were not improved by subsequent polishing with a prophylactic paste containing fine particles. Key words:CAD/CAM, professional dental prophylaxis, prophylactic paste, surface gloss, surface roughness. PMID:28638554
Cleaning of first mirrors in ITER by means of radio frequency discharges.
Leipold, F; Reichle, R; Vorpahl, C; Mukhin, E E; Dmitriev, A M; Razdobarin, A G; Samsonov, D S; Marot, L; Moser, L; Steiner, R; Meyer, E
2016-11-01
First mirrors of optical diagnostics in ITER are subject to charge exchange fluxes of Be, W, and potentially other elements. This may degrade the optical performance significantly via erosion or deposition. In order to restore reflectivity, cleaning by applying radio frequency (RF) power to the mirror itself and thus creating a discharge in front of the mirror will be used. The plasma generated in front of the mirror surface sputters off deposition, restoring its reflectivity. Although the functionality of such a mirror cleaning technique is proven in laboratory experiments, the technical implementation in ITER revealed obstacles which needs to be overcome: Since the discharge as an RF load in general is not very well matched to the power generator and transmission line, power reflections will occur leading to a thermal load of the cable. Its implementation for ITER requires additional R&D. This includes the design of mirrors as RF electrodes, as well as feeders and matching networks inside the vacuum vessel. Mitigation solutions will be evaluated and discussed. Furthermore, technical obstacles (i.e., cooling water pipes for the mirrors) need to be solved. Since cooling water lines are usually on ground potential at the feed through of the vacuum vessel, a solution to decouple the ground potential from the mirror would be a major simplification. Such a solution will be presented.
Nb/Al-AlOx/Nb Edge Junctions for Distributed Mixers
NASA Astrophysics Data System (ADS)
Amos, R. S.; Lichtenberger, A. W.; Tong, C. E.; Blundell, R.; Pan, S.-K.; Kerr, A. R.
We have fabricated high quality Nb/Al-oxide/Al/Nb edge junctions using a Nb/SiO/sub 2/ bi-layer film as the base electrode, suitable for use as traveling wave mixers. An edge is cut in the bi-layer with an ion gun at a 45 degree angle using a photoresist mask. The wafer is then cleaned in-situ with a physical ion gun clean followed by the deposition of a thin Al (a1) film, which is then thermally oxidized, an optional second Al (a2) layer, and a Nb counter electrode. It was found that devices with an a2 layer resulted in superior electrical characteristics, though proximity effects increased strongly with a2 thickness. The counter electrode is defined with an SF/sub 6/+N/sub 2/ reactive ion etch, using the Al barrier layer as an etch stop. The Al barrier layer is then either removed with an Al wet etch to isolate the individual devices, or the devices are separated with an anodization process. Various ion gun cleaning conditions have been examined; in addition, both wet and plasma etch bi-layer edge surface pre-treatments were investigated. It was found that edge junctions with large widths (i.e., those more suitable for traveling wave mixers) typically benefited more from such treatments. Initial receiver results at 260 GHz have yielded a DSB noise temperature of 60 K.
NASA Astrophysics Data System (ADS)
Wang, Chenxi; Xu, Jikai; Zeng, Xiaorun; Tian, Yanhong; Wang, Chunqing; Suga, Tadatomo
2018-02-01
We demonstrate a facile bonding process for combining silicon and quartz glass wafers by a two-step wet chemical surface cleaning. After a post-annealing at 200 °C, strong bonding interfaces with no defects or microcracks were obtained. On the basis of the detailed surface and bonding interface characterizations, the bonding mechanism was explored and discussed. The amino groups terminated on the cleaned surfaces might contribute to the bonding strength enhancement during the annealing. This cost-effective bonding process has great potentials for silicon- and glass-based heterogeneous integrations without requiring a vacuum system.
Characterization of Self-Assembled Monolayers on a Ruthenium Surface
2017-01-01
We have modified and stabilized the ruthenium surface by depositing a self-assembled monolayer (SAM) of 1-hexadecanethiol on a polycrystalline ruthenium thin film. The growth mechanism, dynamics, and stability of these monolayers were studied. SAMs, deposited under ambient conditions, on piranha-cleaned and piranha + H2SO4 cleaned substrates were compared to monolayers formed on H-radical-cleaned Ru surfaces. We found that alkanethiols on H-radical-cleaned Ru formed densely packed monolayers that remained stable when kept in a nitrogen atmosphere. X-ray photoelectron spectroscopy (XPS) shows a distinct sulfur peak (BE = 162.3 eV), corresponding to metal–sulfur bonding. When exposed to ambient conditions, the SAM decayed over a period of hours. PMID:28585831
Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source
NASA Astrophysics Data System (ADS)
Elg, Daniel T.; Panici, Gianluca A.; Peck, Jason A.; Srivastava, Shailendra N.; Ruzic, David N.
2017-04-01
Extreme ultraviolet (EUV) lithography sources expel Sn debris. This debris deposits on the collector optic used to focus the EUV light, lowering its reflectivity and EUV throughput to the wafer. Consequently, the collector must be cleaned, causing source downtime. To solve this, a hydrogen plasma source was developed to clean the collector in situ by using the collector as an antenna to create a hydrogen plasma and create H radicals, which etch Sn as SnH4. This technique has been shown to remove Sn from a 300-mm-diameter stainless steel dummy collector. The H radical density is of key importance in Sn etching. The effects of power, pressure, and flow on radical density are explored. A catalytic probe has been used to measure radical density, and a zero-dimensional model is used to provide the fundamental science behind radical creation and predict radical densities. Model predictions and experimental measurements are in good agreement. The trends observed in radical density, contrasted with measured Sn removal rates, show that radical density is not the limiting factor in this etching system; other factors, such as SnH4 redeposition and energetic ion bombardment, must be more fully understood in order to predict removal rates.
Metal sponge for cryosorption pumping applications
Myneni, G.R.; Kneisel, P.
1995-12-26
A system has been developed for adsorbing gases at high vacuum in a closed area. The system utilizes large surface clean anodized metal surfaces at low temperatures to adsorb the gases. The large surface clean anodized metal is referred to as a metal sponge. The metal sponge generates or maintains the high vacuum by increasing the available active cryosorbing surface area. 4 figs.
NASA Astrophysics Data System (ADS)
Rios, Pablo Fabian
Self-cleaning surfaces have received a great deal of attention, both in research and commercial applications. Transparent and non-transparent self-cleaning surfaces are highly desired. The Lotus flower is a symbol of purity in Asian cultures, even when rising from muddy waters it stays clean and untouched by dirt. The Lotus leaf "self-cleaning" surface is hydrophobic and rough, showing a two-layer morphology. While hydrophobicity produces a high contact angle, surface morphology reduces the adhesion of dirt and water to the surface, thus water drops slide easily across the leaf carrying the dirt particles with them. Nature example in the Lotus-effect and extensive scientific research on related fields have rooted wide acceptance that high hydrophobicity can be obtained only by a proper combination of surface chemistry and roughness. Most researchers relate hydrophobicity to a high contact angle. However, the contact angle is not the only parameter that defines liquid-solid interactions. An additional parameter, the sliding angle, related to the adhesion between the liquid drop and the solid surface is also important in cases where liquid sliding is involved, such as self-cleaning applications. In this work, it is postulated that wetting which is related to the contact angle, and interfacial adhesion, which is related to the sliding angle, are interdependent phenomena and have to be considered simultaneously. A variety of models that relate the sliding angle to forces developed along the contact line between a liquid drop and a solid surface have been proposed in the literature. A new model is proposed here that quantifies the drop sliding phenomenon, based also on the interfacial adhesion across the contact area of the liquid/solid interface. The effects of roughness and chemical composition on the contact and sliding angles of hydrophobic smooth and rough surfaces were studied theoretically and experimentally. The validity of the proposed model was investigated and compared with the existing models. Ultra-hydrophobic non-transparent and transparent coatings for potential self-cleaning applications were produced using hydrophobic chemistry and different configurations of roughening micro and nano-particles, however they present low adhesion and durability. Durability and stability enhancement of such coatings was attempted and improved by different methods.
CPV performance versus soiling effects: Cleaning policies
NASA Astrophysics Data System (ADS)
Sanchez, D.; Trujillo, P.; Martinez, M.; Ferrer, J. P.; Rubio, F.
2012-10-01
In order to improve the performance of the CPV Plants in a cost effective way it is important to define the best cleaning policies, analyzing the effect of soiling in the surface of CPV modules. The energy generation of a CPV technology based in Fresnel Lens improves up to 7% when the surface of the module is cleaned. Some experimental measurements have been carried out over CPV modules and a model has been defined to analyze what is the best cleaning policy for that Technology in Puertollano. The power losses because of soiling and the critical time until the power losses stabilizes are obtained from the measurements; they are used as an input for the simulation. Using an established cleaning cost and the feeding tariff from Spain in 2007 it has been obtained that cleaning only reports a profit during the summer. The conclusion of the work is that the cleaning tasks have to be carefully planned together with the meteorological forecast in order to maximize the investment made in the cleaning.
NASA Technical Reports Server (NTRS)
Blue, G. D.; Moran, C. M.
1985-01-01
Corrosion rates of 304L stainless steel coupons in MON-1 oxidizer have been measured as a function of cleaning procedures employed, surface layer positions, propellant impurity levels, and short-term exposure durations (14 to 90 days). Of special interest was propellant contamination by buildup of soluble iron, which may cause flow decay. Surface treatments employed were combinations of cleaning, pickling, and passivation procedures. Propellants used were MIL-SPEC MON-1 and several types of purified NTO (i.e., low water, low chloride) which may, at a later time, be specified as spacecraft grade. Pretest coupon surface analysis by X-ray photoelectron spectroscopy (XPS-ESCA) has revealed important differences, for the different cleaning procedures, in the make-up of the surface layer, both in composition and state of chemical combination of the elements involved. Comparisons will be made of XPS/ESCA data, for different cleaning procedures, for specimens before and after propellant exposure.
NASA Technical Reports Server (NTRS)
Hintze, Paul E.; Franco, Carolina; Hummerick, Mary E.; Maloney, Phillip R.; Spencer, Lashelle E.
2017-01-01
Cold plasma (CP) cleaning is a dry, non-thermal process, which can provide broad-spectrum antimicrobial activity yet reportedly causes little to no damage to the object being sanitized. Since cold plasma uses no liquids, it has the distinct advantage when used in microgravity of not having to separate liquids from the item being cleaned. This paper will present results on an effort to use low pressure CP to disinfect or sterilize materials for in space applications. Exposure times from 0 to 60 minutes and pressures ranging from 10 to 100 Pa were used to optimize plasma parameters to achieve acceptable kill rates for 3 bacteria, Bacillus cereus, E. coli and Bacillus pumulis SAFR-32 and one fungi, Aspergillus niger. These tests were done on produce and metal coupons to simulate medical equipment. Produce testing was not successful, with unacceptable kill rates and the produce being negatively impacted by exposure to the plasma. The plasma caused a 5 log reduction in the number of viable bacteria on metal coupon tests, which placed the number of viable bacteria below the detection limit. This is a very promising result showing that sterilization of medical equipment with cold plasma is feasible. Scanning Electron Microscope images were taken before and after exposure. The images after plasma exposure shows that the bacteria spores have been physically affected, as their size has gotten smaller and the appearance has changed.
Low temperature self-cleaning properties of superhydrophobic surfaces
NASA Astrophysics Data System (ADS)
Wang, Fajun; Shen, Taohua; Li, Changquan; Li, Wen; Yan, Guilong
2014-10-01
Outdoor surfaces are usually dirty surfaces. Ice accretion on outdoor surfaces could lead to serious accidents. In the present work, the superhydrophobic surface based on 1H, 1H, 2H, 2H-Perfluorodecanethiol (PFDT) modified Ag/PDMS composite was prepared to investigate the anti-icing property and self-cleaning property at temperatures below freezing point. The superhydrophobic surface was deliberately polluted with activated carbon before testing. It was observed that water droplet picked up dusts on the cold superhydrophobic surface and took it away without freezing at a measuring temperature of -10 °C. While on a smooth PFDT surface and a rough surface base on Ag/PDMS composite without PFDT modification, water droplets accumulated and then froze quickly at the same temperature. However, at even lower temperature of -12 °C, the superhydrophobic surface could not prevent the surface water from icing. In addition, it was observed that the frost layer condensed from the moisture pay an important role in determining the low temperature self-cleaning properties of a superhydrophobic surface.
Brushless Cleaning of Solar Panels and Windows
NASA Technical Reports Server (NTRS)
Schneider, H. W.
1982-01-01
Machine proposed for cleaning solar panels and reflectors uses multiple vortexes of air, solvent, and water to remove dust and dirt. Uses no brushes that might abrade solar surfaces and thereby reduce efficiency. Machine can be readily automated and can be used on curved surfaces such as aparbolic reflectors as well as on flat ones. Cleaning fluids are recycled, so that large quantities of water and solvent are not needed.
Zhang, Zhi-Hui; Wang, Hu-Jun; Liang, Yun-Hong; Li, Xiu-Juan; Ren, Lu-Quan; Cui, Zhen-Quan; Luo, Cheng
2018-03-01
Superhydrophobic surfaces have great potential for application in self-cleaning and oil/water separation. However, the large-scale practical applications of superhydrophobic coating surfaces are impeded by many factors, such as complicated fabrication processes, the use of fluorinated reagents and noxious organic solvents and poor mechanical stability. Herein, we describe the successful preparation of a fluorine-free multifunctional coating without noxious organic solvents that was brushed, dipped or sprayed onto glass slides and stainless-steel meshes as substrates. The obtained multifunctional superhydrophobic and superoleophilic surfaces (MSHOs) demonstrated self-cleaning abilities even when contaminated with or immersed in oil. The superhydrophobic surfaces were robust and maintained their water repellency after being scratched with a knife or abraded with sandpaper for 50 cycles. In addition, stainless-steel meshes sprayed with the coating quickly separated various oil/water mixtures with a high separation efficiency (>93%). Furthermore, the coated mesh maintained a high separation efficiency above 95% over 20 cycles of separation. This simple and effective strategy will inspire the large-scale fabrication of multifunctional surfaces for practical applications in self-cleaning and oil/water separation.
Rhoades, J; Gialagkolidou, K; Gogou, M; Mavridou, O; Blatsiotis, N; Ritzoulis, C; Likotrafiti, E
2013-10-01
To investigate the potential use of oregano essential oil as an antimicrobial agent in liquid soap for hand washing and for food contact surface cleaning. Oregano essential oil (O.E.O.) was emulsified in liquid detergent solution. This was challenge tested against a commercial antimicrobial soap in hand washing trials using natural flora. Soap with O.E.O. was as effective as the commercial antimicrobial soap at reducing aerobic plate count on the hands and more effective than plain soap with no additives. Cloths wetted with soap with O.E.O. were used to clean three different surfaces contaminated with four bacterial pathogens. For three of the four pathogens, the addition of 0·5% v/v O.E.O. to the soap solution enhanced cleaning performance and also reduced bacterial survival on the cloth after cleaning. Oregano essential oil (0·5%) is effective as an antimicrobial additive to detergent solutions for hand washing and surface cleaning. This preliminary study has shown that oregano essential oil is a potential alternative to antimicrobials used in various detergents, such as chloroxylenol and triclosan, which can have adverse environmental and health effects. Further development could lead to a commercial product. © 2013 The Society for Applied Microbiology.
Tooth Surface Comparison after Air Polishing and Rubber Cup: A Scanning Electron Microscopy Study.
Camboni, Sara; Donnet, Marcel
2016-03-01
To demonstrate, using microscopic observations, the difference between two well-known oral prophylaxis techniques: polishing paste and air polishing. The observations were performed on human enamel. Enamel samples were obtained from plaque-rich human teeth extracted for orthodontic or clinical purposes. In order to allow a reliable comparison between different applications, each enamel sample was divided into two parts: one underwent air-polishing, whereas polishing paste was applied to the other. AIR-FLOW® Master was selected together with AIR-FLOW® PLUS for the prophylaxis powder application. For the polishing-paste application, several different pastes where used, including Cleanic®, CCS®, Proxyt®, and SuperPolish. A comparative test control was also used by cleaning the enamel with sodium hypochlorite (6%). The enamel treated with AIR-FLOW PLUS showed a similar surface when compared to the control enamel; however, there was complete cleaning down to the tooth microstructure. On the other hand, use of the polishing paste resulted in an enamel surface that appeared abraded and flattened. Moreover, some of the natural irregular enamel surfaces demonstrated some filling in with debris. AIR-FLOW PLUS powder was able to more deeply clean without creating any damage to the enamel, making it suitable for regular cleaning treatments. The polishing pastes were found to abrade the enamel surface, to flatten it, and deposit debris into the microcavities. Both methods having different mechanical effects can therefore be considered as complementary, in that some patients experience a sense of "roughness" following a cleaning. A clinical recommendation for this experience would be to use the air polish first to clean the enamel surface, and follow with a little polishing paste to smooth the surface, if required.
NASA Astrophysics Data System (ADS)
Lee, Jaewon; Kim, Kyung-Hyun; Chung, Chin-Wook
2017-02-01
The remote plasma has been generally used as the auxiliary plasma source for indirect plasma processes such as cleaning or ashing. When tandem plasma sources that contain main and remote plasma sources are discharged, the main plasma is affected by the remote plasma and vice versa. Charged particles can move between two chambers due to the potential difference between the two plasmas. For this reason, the electron energy possibility function of the main plasma can be controlled by adjusting the remote plasma state. In our study, low energy electrons in the main plasma are effectively heated with varying remote plasma powers, and high energy electrons which overcome potential differences between two plasmas—are exchanged with no remarkable change in the plasma density and the effective electron temperature.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Young Cho; Alexander Fridman
2009-04-02
The overall objective of the present work was to develop technologies to reduce freshwater consumption in a cooling tower of coal-based power plant so that one could significantly reduce the need of make-up water. The specific goal was to develop a scale prevention technology based an integrated system of physical water treatment (PWT) and a novel filtration method so that one could reduce the need for the water blowdown, which accounts approximately 30% of water loss in a cooling tower. The present study investigated if a pulsed spark discharge in water could be used to remove deposits from the filtermore » membrane. The test setup included a circulating water loop and a pulsed power system. The present experiments used artificially hardened water with hardness of 1,000 mg/L of CaCO{sub 3} made from a mixture of calcium chloride (CaCl{sub 2}) and sodium carbonate (Na{sub 2}CO{sub 3}) in order to produce calcium carbonate deposits on the filter membrane. Spark discharge in water was found to produce strong shockwaves in water, and the efficiency of the spark discharge in cleaning filter surface was evaluated by measuring the pressure drop across the filter over time. Results showed that the pressure drop could be reduced to the value corresponding to the initial clean state and after that the filter could be maintained at the initial state almost indefinitely, confirming the validity of the present concept of pulsed spark discharge in water to clean dirty filter. The present study also investigated the effect of a plasma-assisted self-cleaning filter on the performance of physical water treatment (PWT) solenoid coil for the mitigation of mineral fouling in a concentric counterflow heat exchanger. The self-cleaning filter utilized shockwaves produced by pulse-spark discharges in water to continuously remove scale deposits from the surface of the filter, thus keeping the pressure drop across the filter at a relatively low value. Artificial hard water was used in the present fouling experiments for three different cases: no treatment, PWT coil only, and PWT coil plus self-cleaning filter. Fouling resistances decreased by 59-72% for the combined case of PWT coil plus filter compared with the values for no-treatment cases. SEM photographs showed much smaller particle sizes for the combined case of PWT coil plus filter as larger particles were continuously removed from circulating water by the filter. The x-ray diffraction data showed calcite crystal structures for all three cases.« less
Self-cleaning poly(dimethylsiloxane) film with functional micro/nano hierarchical structures.
Zhang, Xiao-Sheng; Zhu, Fu-Yun; Han, Meng-Di; Sun, Xu-Ming; Peng, Xu-Hua; Zhang, Hai-Xia
2013-08-27
This paper reports a novel single-step wafer-level fabrication of superhydrophobic micro/nano dual-scale (MNDS) poly(dimethylsiloxane) (PDMS) films. The MNDS PDMS films were replicated directly from an ultralow-surface-energy silicon substrate at high temperature without any surfactant coating, achieving high precision. An improved deep reactive ion etching (DRIE) process with enhanced passivation steps was proposed to easily realize the ultralow-surface-energy MNDS silicon substrate and also utilized as a post-treatment process to strengthen the hydrophobicity of the MNDS PDMS film. The chemical modification of this enhanced passivation step to the surface energy has been studied by density functional theory, which is also the first investigation of C4F8 plasma treatment at molecular level by using first-principle calculations. From the results of a systematic study on the effect of key process parameters (i.e., baking temperature and time) on PDMS replication, insight into the interaction of hierarchical multiscale structures of polymeric materials during the micro/nano integrated fabrication process is experimentally obtained for the first time. Finite element simulation has been employed to illustrate this new phenomenon. Additionally, hierarchical PDMS pyramid arrays and V-shaped grooves have been developed and are intended for applications as functional structures for a light-absorption coating layer and directional transport of liquid droplets, respectively. This stable, self-cleaning PDMS film with functional micro/nano hierarchical structures, which is fabricated through a wafer-level single-step fabrication process using a reusable silicon mold, shows attractive potential for future applications in micro/nanodevices, especially in micro/nanofluidics.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Wieser, Patti; Hopkins, David
The DOE Princeton Plasma Physics Laboratory (PPPL) collaborates to develop fusion as a safe, clean and abundant energy source for the future. This video discusses PPPL's research and development on plasma, the fourth state of matter. In this simulation of plasma turbulence inside PPPL's National Spherical Torus Experiment, the colorful strings represent higher and lower electron density in turbulent plasma as it circles around a donut-shaped fusion reactor; red and orange are higher density. This image is among those featured in the slide show, "Plasmas are Hot and Fusion is Cool," a production of PPPL and the Princeton University Broadcastmore » Center.« less
Plasma Confinement in the UCLA Electric Tokamak.
NASA Astrophysics Data System (ADS)
Taylor, Robert J.
2001-10-01
The main goal of the newly constructed large Electric Tokamak (R = 5 m, a = 1 m, BT < 0.25 T) is to access an omnigeneous, unity beta(S.C. Cowley, P.K. Kaw, R.S. Kelly, R.M. Kulsrud, Phys. fluids B 3 (1991) 2066.) plasma regime. The design goal was to achieve good confinement at low magnetic fields, consistent with the high beta goal. To keep the program cost down, we adopted the use of ICRF as the primary heating source. Consequently, antenna surfaces covering 1/2 of the surface of the tokamak has been prepared for heating and current drive. Very clean hydrogenic plasmas have been achieved with loop voltage below 0.7 volt and densities 3 times above the Murakami limit, n(0) > 8 x 10^12 cm-3 when there is no MHD activity. The electron temperature, derived from the plasma conductivity is > 250 eV with a central electron energy confinement time > 350 msec in ohmic conditions. The sawteeth period is 50 msec. Edge plasma rotation is induced by plasma biasing via electron injection in an analogous manner to that seen in CCT(R.J. Taylor, M.L. Brown, B.D. Fried, H. Grote, J.R. Liberati, G.J. Morales, P. Pribyl, D. Darrow, and M. Ono. Phys. Rev Lett. 63 2365 1989.) and the neoclassical bifurcation is close to that described by Shaing et al(K.C. Shaing and E.C. Crume, Phys. Rev. Lett. 63 2369 (1989).). In the ohmic phase the confinement tends to be MHD limited. The ICRF heating eliminates the MHD disturbances. Under second harmonic heating conditions, we observe an internal confinement peaking characterized by doubling of the core density and a corresponding increase in the central electron temperature. Charge exchange data, Doppler data in visible H-alpha light, and EC radiation all indicate that ICRF heating works much better than expected. The major effort is focused on increasing the power input and controlling the resulting equilibrium. This task appears to be easy since our current pulses are approaching the 3 second mark without RF heating or current drive. Our initial experience with current profile control, needed for high beta plasma equilibrium, will be also discussed.
Code of Federal Regulations, 2014 CFR
2014-07-01
... square foot) is washed for 1 minute. Wipe smooth surfaces with a cleaning solution-soaked disposable absorbent pad such that each 900 cm2 (1 square foot) is wiped for 1 minute. Wash any surface square foot... solution with 1 gallon of clean water per square foot and capture the rinse water. Mop up the wet surface...
Code of Federal Regulations, 2012 CFR
2012-07-01
... square foot) is washed for 1 minute. Wipe smooth surfaces with a cleaning solution-soaked disposable absorbent pad such that each 900 cm2 (1 square foot) is wiped for 1 minute. Wash any surface square foot... solution with 1 gallon of clean water per square foot and capture the rinse water. Mop up the wet surface...
Code of Federal Regulations, 2013 CFR
2013-07-01
... square foot) is washed for 1 minute. Wipe smooth surfaces with a cleaning solution-soaked disposable absorbent pad such that each 900 cm2 (1 square foot) is wiped for 1 minute. Wash any surface square foot... solution with 1 gallon of clean water per square foot and capture the rinse water. Mop up the wet surface...
Code of Federal Regulations, 2010 CFR
2010-07-01
... square foot) is washed for 1 minute. Wipe smooth surfaces with a cleaning solution-soaked disposable absorbent pad such that each 900 cm2 (1 square foot) is wiped for 1 minute. Wash any surface square foot... solution with 1 gallon of clean water per square foot and capture the rinse water. Mop up the wet surface...
Code of Federal Regulations, 2011 CFR
2011-07-01
... square foot) is washed for 1 minute. Wipe smooth surfaces with a cleaning solution-soaked disposable absorbent pad such that each 900 cm2 (1 square foot) is wiped for 1 minute. Wash any surface square foot... solution with 1 gallon of clean water per square foot and capture the rinse water. Mop up the wet surface...
Membrane cleaning with ultrasonically driven bubbles.
Reuter, Fabian; Lauterborn, Sonja; Mettin, Robert; Lauterborn, Werner
2017-07-01
A laboratory filtration plant for drinking water treatment is constructed to study the conditions for purely mechanical in situ cleaning of fouled polymeric membranes by the application of ultrasound. The filtration is done by suction of water with defined constant contamination through a membrane module, a stack of five pairs of flat-sheet ultrafiltration membranes. The short cleaning cycle to remove the cake layer from the membranes includes backwashing, the application of ultrasound and air flushing. A special geometry for sound irradiation of the membranes parallel to their surfaces is chosen. Two frequencies, 35kHz and 130kHz, and different driving powers are tested for their cleaning effectiveness. No cleaning is found for 35kHz, whereas good cleaning results are obtained for 130kHz, with an optimum cleaning effectiveness at moderate driving powers. Acoustic and optic measurements in space and time as well as analytical considerations and numerical calculations reveal the reasons and confirm the experimental results. The sound field is measured in high resolution and bubble structures are high-speed imaged on their nucleation sites as well as during their cleaning work at the membrane surface. The microscopic inspection of the membrane surface after cleaning shows distinct cleaning types in the cake layer that are related to specific bubble behaviour on the membrane. The membrane integrity and permeate quality are checked on-line by particle counting and turbidity measurement of the permeate. No signs of membrane damage or irreversible membrane degradation in permeability are detected and an excellent water permeate quality is retained. Copyright © 2017 Elsevier B.V. All rights reserved.
Al Ashhab, Ashraf; Sweity, Amer; Bayramoglu, Bihter; Herzberg, Moshe; Gillor, Osnat
2017-05-01
Laboratory-scale reverse osmosis (RO) flat-sheet systems were used with two parallel flow cells, one treated with cleaning agents and a control (ie undisturbed). The cleaning efforts increased the affinity of extracellular polymeric substances (EPS) to the RO membrane and altered the biofilm surface structure. Analysis of the membrane biofilm community composition revealed the dominance of Proteobacteria. However, within the phylum Proteobacteria, γ-Proteobacteria dominated the cleaned membrane biofilm, while β-Proteobacteria dominated the control biofilm. The composition of the fungal phyla was also altered by cleaning, with enhancement of Ascomycota and suppression of Basidiomycota. The results suggest that repeated cleaning cycles select for microbial groups that strongly attach to the RO membrane surface by producing rigid and adhesive EPS that hampers membrane performance.
Preliminary Results of Cleaning Process for Lubricant Contamination
NASA Astrophysics Data System (ADS)
Eisenmann, D.; Brasche, L.; Lopez, R.
2006-03-01
Fluorescent penetrant inspection (FPI) is widely used for aviation and other components for surface-breaking crack detection. As with all inspection methods, adherence to the process parameters is critical to the successful detection of defects. Prior to FPI, components are cleaned using a variety of cleaning methods which are selected based on the alloy and the soil types which must be removed. It is also important that the cleaning process not adversely affect the FPI process. There are a variety of lubricants and surface coatings used in the aviation industry which must be removed prior to FPI. To assess the effectiveness of typical cleaning processes on removal of these contaminants, a study was initiated at an airline overhaul facility. Initial results of the cleaning study for lubricant contamination in nickel, titanium and aluminum alloys will be presented.
A decontamination study of simulated chemical and biological agents
NASA Astrophysics Data System (ADS)
Uhm, Han S.; Lee, Han Y.; Hong, Yong C.; Shin, Dong H.; Park, Yun H.; Hong, Yi F.; Lee, Chong K.
2007-07-01
A comprehensive decontamination scheme of the chemical and biological agents, including airborne agents and surface contaminating agents, is presented. When a chemical and biological attack occurs, it is critical to decontaminate facilities or equipments to an acceptable level in a very short time. The plasma flame presented here may provide a rapid and effective elimination of toxic substances in the interior air in isolated spaces. As an example, a reaction chamber, with the dimensions of a 22cm diameter and 30cm length, purifies air with an airflow rate of 5000l/min contaminated with toluene, the simulated chemical agent, and soot from a diesel engine, the simulated aerosol for biological agents. Although the airborne agents in an isolated space are eliminated to an acceptable level by the plasma flame, the decontamination of the chemical and biological agents cannot be completed without cleaning surfaces of the facilities. A simulated sterilization study of micro-organisms was carried out using the electrolyzed ozone water. The electrolyzed ozone water very effectively kills endospores of Bacillus atrophaeus (ATCC 9372) within 3min. The electrolyzed ozone water also kills the vegetative micro-organisms, fungi, and virus. The electrolyzed ozone water, after the decontamination process, disintegrates into ordinary water and oxygen without any trace of harmful materials to the environment.
Zhang, Hui; Li, Yuqi; Xu, Yaoguang; Lu, Zexiang; Chen, Lihui; Huang, Liulian; Fan, Mizi
2016-10-12
To deal with marine oil spillage and chemical leakage issues, a highly efficient absorbent (cellulose based aerogel) with a low density (ρ < 0.034 g cm -3 , φ > 98.5%) and high mechanical strength was fabricated via a novel physical-chemical foaming method, plasma treatment and subsequent silane modification process. This aerogel has a perfect 3D skeleton and interconnected pores similar to honeycomb, which are favorable to oil adsorption and storage. More importantly, without introducing additional micro/nanoparticles, the rough micro/nano structure of the surface was directly constructed using plasma irradiation in this study. The low surface energy substrate was further introduced using a simple physical-soaking method and the resulting aerogel exhibited excellent superhydrophobicity (WCA > 156°) and superoleophilicity (OCA = 0°), which can selectively and efficiently absorb various oils or organic solvents from polluted water. In addition, this aerogel has a high storage capacity and absorption capacity (up to 4300% and 99% of its weight and volume, respectively). More interestingly, this aerogel exhibits excellent mechanical abrasion resistance and corrosion resistance even in strong acid, alkali solution and salt marine environment. The aerogel could be reused more than 30 times after removal of the absorbed oil by rinsing with ethanol.
Casoli, Antonella; Di Diego, Zaira; Isca, Clelia
2014-12-01
Cleaning is one of the most important, delicate, and at the same time controversial processes in the conservation treatment of paintings. Although a strict definition of cleaning would be the removal of dirt, grime, or other accretions (surface cleaning), in the conservation field, cleaning is used in the broader meaning to include thinning/removing altered or “unwanted layers” of materials without damaging or altering the physicochemical properties of the surfaces to be preserved. The cleaning of unvarnished paintings is one of the most critical issues that are currently discussed. Several studies exist regarding different cleaning tools, such as gels, soaps, enzymes, ionic liquids, and foams, as well as various dry methods and lasers, but only a few have been performed on the risk associated with the use of water and organic solvents for the cleaning treatments in relation to the original paint binder. The aim of the study is to verify analytically the behavior of water gelling agents during cleaning treatments and the interaction of the following elements: water or organic solvents applied for the removal of gel residues with the original lipid paint binder. For this purpose, the study was conducted on a fragment of canvas painting (sixteenth to seventeenth century) of Soprintendenza per i Beni Storici, Artistici ed Etnoantropologici del Friuli Venezia Giulia (Superintendence for the Historical, Artistic and Ethno-anthropological Heritage of Friuli Venezia Giulia), Udine by means of Fourier transform infrared spectroscopy, gas chromatography/mass spectrometry, and scanning electron microscopy.
Gomes, Vera; Dionísio, Amélia; Santiago Pozo-Antonio, J
2018-06-01
Graffiti are one of the most severe threats to Stone Cultural Heritage and are most of the times removed after long periods of environmental exposure. This research intends to evaluate the influence of the ageing of the graffitis on the effectiveness of their cleaning. So, comparative studies on unaged and on artificially SO 2 aged samples were conducted. Four graffiti spray colours were applied on a granite stone and cleaned with two chemical commercial cleaners: a solution of KOH and a solution of n-butyl acetate, xylene and alcohol isobutyl. The spray paints (unaged and aged) and cleaning effectiveness were characterized by stereomicroscopy, colour spectrophotometry, adhesion tests, SEM, μEDXRF, XRD and FTIR. The cleaning effectiveness was also evaluated through surface roughness and static contact angle measurements. The alkyd graffiti paints presented greatest resistance under SO 2 rich environments than the polyethylene paint. The aged polyethylene paint showed chemical modifications that resulted in graffiti losses and neo formed mineralogical phases in the surface of the paint. After ageing, the paints became more difficult to clean, showed higher global colour changes and higher residue percentages. No significant roughness variations were detected after chemical cleaning. After the cleaning procedures aged surfaces became more water repellent comparatively to unaged and reference samples. The best cleaning effectiveness was mainly achieved with the potassium hydroxide solution. Copyright © 2017 Elsevier B.V. All rights reserved.
NASA Technical Reports Server (NTRS)
Goreva, Y. S.; Humanyun, M.; Burnett, D. S.; Jurewicz, A. J.; Gonzalez, C. P.
2014-01-01
ToF-SIMS images of Genesis sample surfaces contain an incredible amount of important information, but they also show that the crash-derived surface contamination has many components, presenting a challenge to cleaning. Within the variability, we have shown that there are some samples which appear to be clean to begin with, e.g. 60471, and some are more contaminated. Samples 60493 and 60500 are a part of a focused study of the effectiveness of aqua regia and/or sulfuric acid cleaning of small flight Si implanted with Li-6 using ToF-SIMS.
Detecting Fermi-level shifts by Auger electron spectroscopy in Si and GaAs
DOE Office of Scientific and Technical Information (OSTI.GOV)
Debehets, J.; Homm, P.; Menghini, M.
In this study, changes in surface Fermi-level of Si and GaAs, caused by doping and cleaning, are investigated by Auger electron spectroscopy. Based on the Auger voltage contrast, we compared the Auger transition peak energy but with higher accuracy by using a more accurate analyzer and an improved peak position determination method. For silicon, a peak shift as large as 0.46 eV was detected when comparing a cleaned p-type and n-type wafer, which corresponds rather well with the theoretical difference in Fermi-levels. If no cleaning was applied, the peak position did not differ significantly for both wafer types, indicating Fermi-levelmore » pinning in the band gap. For GaAs, peak shifts were detected after cleaning with HF and (NH 4) 2S-solutions in an inert atmosphere (N 2-gas). Although the (NH 4) 2S-cleaning in N 2 is very efficient in removing the oxygen from the surface, the observed Ga- and As-peak shifts are smaller than those obtained after the HF-cleaning. It is shown that the magnitude of the shift is related to the surface composition. After Si-deposition on the (NH 4) 2S-cleaned surface, the Fermi-level shifts back to a similar position as observed for an as-received wafer, indicating that this combination is not successful in unpinning the Fermi-level of GaAs.« less
Detecting Fermi-level shifts by Auger electron spectroscopy in Si and GaAs
Debehets, J.; Homm, P.; Menghini, M.; ...
2018-01-12
In this study, changes in surface Fermi-level of Si and GaAs, caused by doping and cleaning, are investigated by Auger electron spectroscopy. Based on the Auger voltage contrast, we compared the Auger transition peak energy but with higher accuracy by using a more accurate analyzer and an improved peak position determination method. For silicon, a peak shift as large as 0.46 eV was detected when comparing a cleaned p-type and n-type wafer, which corresponds rather well with the theoretical difference in Fermi-levels. If no cleaning was applied, the peak position did not differ significantly for both wafer types, indicating Fermi-levelmore » pinning in the band gap. For GaAs, peak shifts were detected after cleaning with HF and (NH 4) 2S-solutions in an inert atmosphere (N 2-gas). Although the (NH 4) 2S-cleaning in N 2 is very efficient in removing the oxygen from the surface, the observed Ga- and As-peak shifts are smaller than those obtained after the HF-cleaning. It is shown that the magnitude of the shift is related to the surface composition. After Si-deposition on the (NH 4) 2S-cleaned surface, the Fermi-level shifts back to a similar position as observed for an as-received wafer, indicating that this combination is not successful in unpinning the Fermi-level of GaAs.« less
AES and LEED study of the zinc blende SiC(100) surface
NASA Technical Reports Server (NTRS)
Dayan, M.
1985-01-01
Auger and LEED measurements have been carried out on the (100) surface of zinc blende SiC. Two different phases of the clean surface, in addition to two kinds of oxygen-covered surfaces, have been obtained, identified, and discussed. In the oxygen-covered surface, the oxygen is bonded to the Si. The carbon-rich phase is reconstructed (2 x 1), similar to the (100) clean surfaces of Si, Ge, and diamond. The Si-topped surface is reconstructed. A model of alternating Si dimers is suggested for this surface.
Bioinspired superhydrophobic, self-cleaning and low drag surfaces
NASA Astrophysics Data System (ADS)
Bhushan, Bharat
2013-09-01
Nature has evolved objects with desired functionality using commonly found materials. Nature capitalizes on hierarchical structures to achieve functionality. The understanding of the functions provided by objects and processes found in nature can guide us to produce nanomaterials, nanodevices, and processes with desirable functionality. This article provides an overview of four topics: (1) Lotus Effect used to develop superhydrophobic and self-cleaning/antifouling surfaces with low adhesion, (2) Shark Skin Effect to develop surfaces with low fluid drag and anti-fouling characteristics, and (3-4) Rice Leaf and Butterfly Wing Effect to develop superhydrophobic and self-cleaning surfaces with low drag. Rice Leaf and Butterfly Wings combine the Shark Skin and Lotus Effects.
NASA Astrophysics Data System (ADS)
Zerbe, Kristina; Iberler, Marcus; Jacoby, Joachim; Wagner, Christopher
2016-09-01
The intention of the project is the development and improvement of an atmospheric plasma jet based on various discharge forms (e.g. DBD, RF, micro-array) for sterilisation of biomedical equipment and investigation of biomolecules under the influence of plasma stress. The major objective is to design a plasma jet with a large area and an extended length. Due to the success on small scale plasma sterilisation the request of large area plasma has increased. Many applications of chemical disinfection in environmental and medical cleaning could thereby be complemented. Subsequently, the interaction between plasma and biomolecules should be investigated to improve plasma strerilisation. Special interest will be on non equilibrium plasma electrons affecting the chemical bindings of organic molecules.
40 CFR 761.372 - Specific requirements for relatively clean surfaces.
Code of Federal Regulations, 2010 CFR
2010-07-01
... 40 Protection of Environment 30 2010-07-01 2010-07-01 false Specific requirements for relatively clean surfaces. 761.372 Section 761.372 Protection of Environment ENVIRONMENTAL PROTECTION AGENCY (CONTINUED) TOXIC SUBSTANCES CONTROL ACT POLYCHLORINATED BIPHENYLS (PCBs) MANUFACTURING, PROCESSING...
Surface Analysis of the Laser Cleaned Metal Threads
NASA Astrophysics Data System (ADS)
Sokhan, M.; Hartog, F.; McPhail, D.
The laser cleaning of the tarnished silver threads was carried out using Nd:YAG laser radiation at IR (1064 nm) and visible wavelengths (532 nm). The preliminary tests were made on the piece of silk with the silver embroidery with the clean and tarnished areas. FIBS and SIMS analysis were used for analysing the condition of the surface before and after laser irradiation. It was found that irradiation below 0.4 J/cm-2 and higher than 1.0 J/cm-2 fluences aggravates the process of tarnishing and leads to the yellowing effect. The results of preliminary tests were used for finding the optimum cleaning regime for the laser cleaning of the real museum artefact: "Women Riding Jacket" dated to the beginning of 18th century.
Receiving and use of streams of monodisperse ice granules for cleaning and deactivation of surfaces
NASA Astrophysics Data System (ADS)
Boukharov, A.; Balashov, A.; Timohin, A.; Ivanov, A.; Holin, B.
2017-11-01
The most generally useful methods for cleaning and processing of surfaces are the sand-jets and shot blasting jets. Installations of this kind are used for cleaning of corrosion surfaces, the oil-dirt deposits, paint coatings. However the use of these installations follows to high investment and operational expenditure, larger risk of operators disease, the negative affect for a environment. These problems can be solved with the use of new cleaning method through application of mono-disperse (identical by the size and the form) ice granules of 300 - 1000 microns, accelerated by air stream in the nozzle device to the speed of 10 - 100 m/s. In view of the extreme complexity of the receiving such particles by means of cooling and the subsequent freezing of water drops are necessary additional experimental researches. For study of thermal processes of receiving mono-disperse ice granules the experimental installation was created and experiments on deactivation and cleaning of surfaces with pollution of various types are made. Experiments showed that by means of a stream of the accelerated ice granules it is rather successfully possible to delete oil-dirt deposits, outdated paint coats and rust. Besides, efficient deactivation of radioactive surfaces is possible. The coefficient deactivation of γ activity is highest.
Theoretical Studies about Adsorption on Silicon Surface
NASA Astrophysics Data System (ADS)
Huang, Yan; Chen, Xiaoshuang; Zhu, Xiao Yan; Duan, He; Zhou, Xiao Hao; Lu, Wei
In this review paper, we address the important research topic of adsorption on the silicon surface. The deposition of single Si ad-species (adatom and ad-dimer) on the p(2×2) reconstructed Si(100) surface has been simulated by the empirical tight-binding method. Using the clean and defective Si surfaces as the deposition substrates, the deposition energies are mapped out around the clean surface, dimer vacancies, steps and kink structures. The binding sites, saddle points and several possible diffusion paths are obtained from the calculated energy. With further analysis of the deposition and diffusion behaviors, the influences of the surface defects can be found. Then, by adopting the first-principle calculations, the adsorptions of the II-VI group elements on the clean and As-passivated Si(211) substrates have been calculated as the example of adsorption on the high-miller-index Si surface.
Does improving surface cleaning and disinfection reduce health care-associated infections?
Donskey, Curtis J
2013-05-01
Contaminated environmental surfaces provide an important potential source for transmission of health care-associated pathogens. In recent years, a variety of interventions have been shown to be effective in improving cleaning and disinfection of surfaces. This review examines the evidence that improving environmental disinfection can reduce health care-associated infections. Published by Mosby, Inc.
... dressing. Wash your hands with soap and warm water. Also clean under your nails. Rinse, then dry your hands with a clean towel . Make sure you have all the supplies handy. Have a clean work surface. Remove the ...
Processing materials inside an atmospheric-pressure radiofrequency nonthermal plasma discharge
Selwyn, Gary S.; Henins, Ivars; Park, Jaeyoung; Herrmann, Hans W.
2006-04-11
Apparatus for the processing of materials involving placing a material either placed between an radio-frequency electrode and a ground electrode, or which is itself one of the electrodes. This is done in atmospheric pressure conditions. The apparatus effectively etches or cleans substrates, such as silicon wafers, or provides cleaning of spools and drums, and uses a gas containing an inert gas and a chemically reactive gas.
NASA Technical Reports Server (NTRS)
Steurer, Wolfgang
1992-01-01
This process employs a thermal plasma for the separation and production of oxygen and metals. It is a continuous process that requires no consumables and relies entirely on space resources. The almost complete absence of waste renders it relatively clean. It can be turned on or off without any undesirable side effects or residues. The prime disadvantage is its high power consumption.
Chen, Chang-Hua; Tu, Chi-Chao; Kuo, Han-Yueh; Zeng, Rong-Fong; Yu, Cheng-Sheng; Lu, Henry Horng-Shing; Liou, Ming-Li
2017-01-01
Terminal disinfection and daily cleaning have been performed in hospitals in Taiwan for many years to reduce the risks of healthcare-associated infections. However, the effectiveness of these cleaning approaches and dynamic changes of surface microbiota upon cleaning remain unclear. Here, we report the surface changes of bacterial communities with terminal disinfection and daily cleaning in a medical intensive care unit (MICU) and only terminal disinfection in a respiratory care center (RCC) using 16s ribosomal RNA (rRNA) metagenomics. A total of 36 samples, including 9 samples per sampling time, from each ward were analysed. The clinical isolates were recorded during the sampling time. A large amount of microbial diversity was detected, and human skin microbiota (HSM) was predominant in both wards. In addition, the colonization rate of the HSM in the MICU was higher than that in the RCC, especially for Moraxellaceae. A higher alpha-diversity (p = 0.005519) and a lower UniFrac distance was shown in the RCC due to the lack of daily cleaning. Moreover, a significantly higher abundance among Acinetobacter sp., Streptococcus sp. and Pseudomonas sp. was shown in the RCC compared to the MICU using the paired t test. We concluded that cleaning changes might contribute to the difference in diversity between two wards.
Haidar Ahmad, Imad A; Tam, James; Li, Xue; Duffield, William; Tarara, Thomas; Blasko, Andrei
2017-02-05
The parameters affecting the recovery of pharmaceutical residues from the surface of stainless steel coupons for quantitative cleaning verification method development have been studied, including active pharmaceutical ingredient (API) level, spiking procedure, API/excipient ratio, analyst-to-analyst variability, inter-day variability, and cleaning procedure of the coupons. The lack of a well-defined procedure that consistently cleaned coupon surface was identified as the major contributor to low and variable recoveries. Assessment of acid, base, and oxidant washes, as well as the order of treatment, showed that a base-water-acid-water-oxidizer-water wash procedure resulted in consistent, accurate spiked recovery (>90%) and reproducible results (S rel ≤4%). By applying this cleaning procedure to the previously used coupons that failed the cleaning acceptance criteria, multiple analysts were able to obtain consistent recoveries from day-to-day for different APIs, and API/excipient ratios at various spike levels. We successfully applied our approach for cleaning verification of small molecules (MW<1000Da) as well as large biomolecules (MW up to 50,000Da). Method robustness was greatly influenced by the sample preparation procedure, especially for analyses using total organic carbon (TOC) determination. Copyright © 2016 Elsevier B.V. All rights reserved.
Little, Christine; Sagoo, Satnam
2009-12-01
This study was undertaken to assess the cleanliness of food preparation areas, cleaning methods used, and the microbiological quality of water used by 1258 mobile food vendors in the UK. Samples collected included potable water (1102), cleaning cloths (801) and environmental swabs from food preparation surfaces (2704). Cleaning cloths were more heavily contaminated with Aerobic Colony Counts, Enterobacteriaceae, Escherichia coli, and Staphylococcus aureus compared to surfaces sampled. Surfaces that were visually dirty, wet, and chopping boards that were plastic or damaged also had high levels of these bacteria. Fifty-four percent of potable water samples were of poor microbiological quality; i.e. contained coliforms, E. coli and/or enterococci. A documented food safety management system was only evident in 40.1% of vendors and cleaning schedules were only used by 43.6%. Deficiencies in the correct use of cleaning materials, such as dilution factors and the minimum contact time for disinfectants, were identified.
Evaluation of control parameters for Spray-In-Air (SIA) aqueous cleaning for shuttle RSRM hardware
NASA Technical Reports Server (NTRS)
Davis, S. J.; Deweese, C. D.
1995-01-01
HD-2 grease is deliberately applied to Shuttle Redesigned Solid Rocket Motor (RSRM) D6AC steel hardware parts as a temporary protective coating for storage and shipping. This HD-2 grease is the most common form of surface contamination on RSRM hardware and must be removed prior to subsequent surface treatment. Failure to achieve an acceptable level of cleanliness (HD-2 calcium grease removal) is a common cause of defect incidence. Common failures from ineffective cleaning include poor adhesion of surface coatings, reduced bond performance of structural adhesives, and failure to pass cleanliness inspection standards. The RSRM hardware is currently cleaned and refurbished using methyl chloroform (1,1,1-trichloroethane). This chlorinated solvent is mandated for elimination due to its ozone depleting characteristics. This report describes an experimental study of an aqueous cleaning system (which uses Brulin 815 GD) as a replacement for methyl chloroform. Evaluation of process control parameters for this cleaner are discussed as well as cleaning mechanisms for a spray-in-air process.
Bismuth Passivation Technique for High-Resolution X-Ray Detectors
NASA Technical Reports Server (NTRS)
Chervenak, James; Hess, Larry
2013-01-01
The Athena-plus team requires X-ray sensors with energy resolution of better than one part in 3,000 at 6 keV X-rays. While bismuth is an excellent material for high X-ray stopping power and low heat capacity (for large signal when an X-ray is stopped by the absorber), oxidation of the bismuth surface can lead to electron traps and other effects that degrade the energy resolution. Bismuth oxide reduction and nitride passivation techniques analogous to those used in indium passivation are being applied in a new technique. The technique will enable improved energy resolution and resistance to aging in bismuth-absorber-coupled X-ray sensors. Elemental bismuth is lithographically integrated into X-ray detector circuits. It encounters several steps where the Bi oxidizes. The technology discussed here will remove oxide from the surface of the Bi and replace it with nitridized surface. Removal of the native oxide and passivating to prevent the growth of the oxide will improve detector performance and insulate the detector against future degradation from oxide growth. Placing the Bi coated sensor in a vacuum system, a reduction chemistry in a plasma (nitrogen/hydrogen (N2/H2) + argon) is used to remove the oxide and promote nitridization of the cleaned Bi surface. Once passivated, the Bi will perform as a better X-ray thermalizer since energy will not be trapped in the bismuth oxides on the surface. A simple additional step, which can be added at various stages of the current fabrication process, can then be applied to encapsulate the Bi film. After plasma passivation, the Bi can be capped with a non-diffusive layer of metal or dielectric. A non-superconducting layer is required such as tungsten or tungsten nitride (WNx).
Wet cleaning and surface characterization of Si 1- xGe x virtual substrates after a CMP step
NASA Astrophysics Data System (ADS)
Abbadie, A.; Hartmann, J. M.; Besson, P.; Rouchon, D.; Martinez, E.; Holliger, P.; Di Nardo, C.; Campidelli, Y.; Billon, T.
2008-08-01
New reactants such as ozone dissolved in ultra-pure water have been widely used the last few years instead of the original Radio Corporation of America (RCA) cleaning (which is a combination of the Standard Cleaning 1 (SC1) and the Standard Cleaning 2 (SC2)). In a first part of the study (Microelectron. Eng. 83 (2006) 1986), we had quantified the efficiency of a new cleaning sequence (that calls upon HF and H 2O/O 3 solutions) on polished Si 1- xGe x virtual substrates ( x = 0.2-0.5). We are discussing here the surface morphology and wetability together with the oxide thickness and structure typically obtained after this so-called "DDC-SiGe" wet cleaning. Flat surface morphologies are found after cleaning whatever the Ge content (from 20 to 50%). Typical root mean square roughness is around 0.4 nm. We have used X-ray Photoelectron Spectroscopy to determine the characteristics of the surface termination after this "DDC-SiGe" cleaning. An oxide mainly composed of SiO 2 is formed, with a low fraction of Ge sub-oxide and GeO 2. The distribution of chemical species is not that different from the one obtained after the use of a SC1 cleaning. However, the chemical oxide formed is slightly thicker. Such a HF/O 3 cleaning leads, when used on thick Ge layers grown on Si, to the formation of a really thin Ge sub-oxide. Our oxidation model assumes a competition in O 3 solutions between the oxidation rates of Si and Ge atoms (faster for Si) and the dissolution of the Ge oxide formed in solution. This mechanism, which implies the formation of a slightly porous oxide, is different from the one seeming to occur in SC1-based solutions. Indeed, the addition of surfactant in a SC1 solution modifies the oxidation rate compared to standard SC1 or O 3-based solutions, suggesting a diffusion of reactants towards the interface between the SiGe and the oxide in formation, assisted by the reactions of species within the cleaning solutions.
Surface preparation of Ti-3Al-2.5V alloy tubes for welding using a fiber laser
NASA Astrophysics Data System (ADS)
Kumar, Aniruddha; Gupta, Mool C.
2009-11-01
Ti-3Al-2.5V tubes are widely used in aircraft hydraulic systems. Meticulous surface preparation before welding is necessary to obtain a sound weld involving these alloy tubes. Conventionally this is done by cleaning with environmentally malign toxic chemicals, such as, hydrofluoric acid and nitric acid. This paper describes the laser-cleaning process of the surface of these tubes with a fiber laser as a preparation for pulsed gas tungsten arc welding and results obtained. A simple one-dimensional heat equation has been solved to evaluate the temperature profile of the irradiated surface. It is shown that surface preparation by laser cleaning can be an environmentally friendly alternative process by producing acceptable welds with laser-processed tubes.
Cleaning of nanopillar templates for nanoparticle collection using PDMS
NASA Astrophysics Data System (ADS)
Merzsch, S.; Wasisto, H. S.; Waag, A.; Kirsch, I.; Uhde, E.; Salthammer, T.; Peiner, E.
2011-05-01
Nanoparticles are easily attracted by surfaces. This sticking behavior makes it difficult to clean contaminated samples. Some complex approaches have already shown efficiencies in the range of 90%. However, a simple and cost efficient method was still missing. A commonly used silicone for soft lithography, PDMS, is able to mold a given surface. This property was used to cover surface-bonded particles from all other sides. After hardening the PDMS, particles are still embedded. A separation of silicone and sample disjoins also the particles from the surface. After this procedure, samples are clean again. This method was first tested with carbon particles on Si surfaces and Si pillar samples with aspect ratios up to 10. Experiments were done using 2 inch wafers, which, however, is not a size limitation for this method.
Chen, Baiyi; Qiu, Jianhui; Sakai, Eiichi; Kanazawa, Nobuhiro; Liang, Ruilu; Feng, Huixia
2016-07-13
Conventional superhydrophobic surfaces have always depended on expensive, sophisticated, and fragile roughness structures. Therefore, poor robustness has turned into the bottleneck for large-scale industrial applications of the superhydrophobic surfaces. To handle this problem, a superhydrophobic surface with firm robustness urgently needs to be developed. In this work, we created a versatile strategy to fabricate robust, self-cleaning, and superhydrophobic surfaces for both soft and hard substrates. We created an ethanol based suspension of perfluorooctyltriethoxysilane-mdodified calcium carbonate nanoparticles which can be sprayed onto both hard and soft substrates to form superhydrophobic surfaces. For all kinds of substrates, spray adhesive was directly coated onto abluent substrate surfaces to promote the robustness. These superhydrophobic surfaces showed remarkable robustness against knife scratch and sandpaper abrasion, while retaining its superhydrophobicity even after 30 abrasion cycles with sandpaper. What is more, the superhydrophobic surfaces have shown promising potential applications in self-cleaning and oil-water separation. The surfaces retained their self-cleaning property even immersed in oil. In addition to oil-water separation, the water contents in oil after separation of various mixtures were all below 150 ppm, and for toluene even as low as 55 ppm. Furthermore, the as-prepared device for oil-water separation could be cycled 6 times and still retained excellent oil-water separation efficiency.
Polymer membranes as separators for supercapacitors
NASA Astrophysics Data System (ADS)
Szubzda, Bronisław; Szmaja, Aleksandra; Ozimek, Mariusz; Mazurkiewicz, Sławomir
2014-12-01
The purpose of the studies described was to examine the influence of low-energy plasma modification of polyamide and polypropylene polymer nonwoven fabrics on the usable properties of supercapacitors when using these fabrics as the separator material. To achieve this goal the following investigations were carried out: testing the time required for electrolyte saturation of separators and the conductivity of the electrolyte contained in the separator, as well as electrochemical examinations of supercapacitor models in which the modified fabric separators were used. The tests conducted fully confirm the usability of this modification for cleaning the surface and improving the wettability of separators by the electrolyte, which in turn results in a significant decrease of the internal resistance of the supercapacitor, thus increasing the usable power of the device.
40 CFR 761.369 - Pre-cleaning the surface.
Code of Federal Regulations, 2010 CFR
2010-07-01
... 40 Protection of Environment 30 2010-07-01 2010-07-01 false Pre-cleaning the surface. 761.369 Section 761.369 Protection of Environment ENVIRONMENTAL PROTECTION AGENCY (CONTINUED) TOXIC SUBSTANCES CONTROL ACT POLYCHLORINATED BIPHENYLS (PCBs) MANUFACTURING, PROCESSING, DISTRIBUTION IN COMMERCE, AND USE...
NASA Astrophysics Data System (ADS)
Hamilton, J.
2012-09-01
Protection and cleaning of precision optical surfaces on large scale astronomical instruments has entered a new era. First surface mirrors have been restored to "like-new" condition avoiding the expense and downtime of recoating. Nearly 10 years of testing and evaluation at a variety of sites including optics at Vandenberg Air Force Base, the Canada France Hawaii Telescope (CFHT) and the W.M Keck Telescope on Mauna Kea, have yielded impressive results: restored reflectivity, no residue, insitu cleaning and better coating performance when used as a precleaner when coating. Metrology and research in our labs has resulted in these novel, commercially available polymeric stripcoatings that are applied as a liquid and subsequently peeled off the substrate as a solid film. These designer polymer solutions safely clean and protect a wide variety of nanostructured surfaces and leave the surface almost atomically clean. Contaminant removal was monitored by a variety of techniques including Reflectivity, Nomarski, Atomic Force and Scanning Electron Microscopy as well as XPS. In addition, data demonstrates that the material safely removes particulate contamination and finger oils from nanostructures such as the 300nm wide lines on diffraction gratings and similar submicron features on Si wafers. High power laser damage testing found no residue on the optical surfaces following dried film removal and YAG laser damage thresholds after cleaning on coated BK7 of 15J/cm2 at 20ns and 20Hz were unchanged. Additionally to these adhesion tunable polymer systems, nanotube and graphene doped, ESD free polymer strip coatings for surface protection, nanoreplication, cleaning and dust mitigation have also been developed. Our coatings have been successfully used on diverse surfaces like high power laser optics, the Hope Diamond in Washington DC, CCD s for the 520 megapixel Dark Energy Survey Camera being built at Fermilab and lithographically fabbed detector surfaces for the Cryogenic Dark Matter Search.
Surface preparation of substances for continuous convective assembly of fine particles
Rossi, Robert
2003-01-01
A method for producing periodic nanometer-scale arrays of metal or semiconductor junctions on a clean semiconductor substrate surface is provided comprising the steps of: etching the substrate surface to make it hydrophilic, forming, under an inert atmosphere, a crystalline colloid layer on the substrate surface, depositing a metal or semiconductor material through the colloid layer onto the surface of the substrate, and removing the colloid from the substrate surface. The colloid layer is grown on the clean semiconductor surface by withdrawing the semiconductor substrate from a sol of colloid particles.
40 CFR 463.20 - Applicability; description of the cleaning water subcategory.
Code of Federal Regulations, 2014 CFR
2014-07-01
.... Processes in the cleaning water subcategory are processes where water comes in contact with the plastic product for the purpose of cleaning the surface of the product and where water comes in contact with...
40 CFR 463.20 - Applicability; description of the cleaning water subcategory.
Code of Federal Regulations, 2012 CFR
2012-07-01
.... Processes in the cleaning water subcategory are processes where water comes in contact with the plastic product for the purpose of cleaning the surface of the product and where water comes in contact with...
40 CFR 463.20 - Applicability; description of the cleaning water subcategory.
Code of Federal Regulations, 2011 CFR
2011-07-01
... the cleaning water subcategory are processes where water comes in contact with the plastic product for the purpose of cleaning the surface of the product and where water comes in contact with shaping...
40 CFR 463.20 - Applicability; description of the cleaning water subcategory.
Code of Federal Regulations, 2013 CFR
2013-07-01
.... Processes in the cleaning water subcategory are processes where water comes in contact with the plastic product for the purpose of cleaning the surface of the product and where water comes in contact with...
Alayande, Abayomi Babatunde; Kim, Lan Hee; Kim, In S
2016-01-01
In this study, an environmentally friendly compound, hydroxypropyl-beta-cyclodextrin (HP-β-CD) was applied to clean reverse osmosis (RO) membranes fouled by microorganisms. The cleaning with HP-β-CD removed the biofilm and resulted in a flux recovery ratio (FRR) of 102%. As cleaning efficiency is sometimes difficult to determine using flux recovery data alone, attached bacterial cells and extracellular polymeric substances (EPS) were quantified after cleaning the biofouled membrane with HP-β-CD. Membrane surface characterization using scanning electron microscopy (SEM), attenuated total reflectance Fourier transform infrared (ATR-FTIR) and atomic force microscopy (AFM) confirmed the effectiveness of HP-β-CD in removal of biofilm from the RO membrane surface. Finally, a comparative study was performed to investigate the competitiveness of HP-β-CD with other known cleaning agents such as sodium dodecyl sulfate (SDS), ethylenediaminetetraacetic acid (EDTA), Tween 20, rhamnolipid, nisin, and surfactin. In all cases, HP-β-CD was superior.
Temperature control of thermal-gas-dynamical installation in cleaning oil-well tubes
NASA Astrophysics Data System (ADS)
Penner, V. A.; Martemyanov, D. B.; Pshenichnikova, V. V.
2017-08-01
The article provides the study results of cleaning oil-well tubes, the oil-well tube failure reasons for service by their types have been considered. The chemical method of cleaning oil-well tubes as the least expensive has been reviewed when acid solution moves to the interptube space mixing up with oil and liquidates paraffin and pitches deposits on the internal pipe surface. Except the chemical method of pipes cleaning the mechanical one was considered as well. Also the disadvantages -such as the low productivity of cleaning and design complexity- of this deposits removal method on the internal oil-well tube surface have been considered. An effective method for cleaning oil-well tubing from paraffin and pitches by the thermodynamic plant based on the aircraft engine has been introduced for the first time. The temperature distribution graph in the gas stream at the engine output has been given.
Molecular bacterial community analysis of clean rooms where spacecraft are assembled.
Moissl, Christine; Osman, Shariff; La Duc, Myron T; Dekas, Anne; Brodie, Eoin; DeSantis, Todd; Desantis, Tadd; Venkateswaran, Kasthuri
2007-09-01
Molecular bacterial community composition was characterized from three geographically distinct spacecraft-associated clean rooms to determine whether such populations are influenced by the surrounding environment or the maintenance of the clean rooms. Samples were collected from facilities at the Jet Propulsion Laboratory (JPL), Kennedy Space Flight Center (KSC), and Johnson Space Center (JSC). Nine clone libraries representing different surfaces within the spacecraft facilities and three libraries from the surrounding air were created. Despite the highly desiccated, nutrient-bare conditions within these clean rooms, a broad diversity of bacteria was detected, covering all the main bacterial phyla. Furthermore, the bacterial communities were significantly different from each other, revealing only a small subset of microorganisms common to all locations (e.g. Sphingomonas, Staphylococcus). Samples from JSC assembly room surfaces showed the greatest diversity of bacteria, particularly within the Alpha- and Gammaproteobacteria and Actinobacteria. The bacterial community structure of KSC assembly surfaces revealed a high presence of proteobacterial groups, whereas the surface samples collected from the JPL assembly facility showed a predominance of Firmicutes. Our study presents the first extended molecular survey and comparison of NASA spacecraft assembly facilities, and provides new insights into the bacterial diversity of clean room environments .
Structural changes in lymphocytes membrane of Chernobyl clean-up workers from Latvia.
Kalnina, Inta; Zvagule, Tija; Gabruseva, Natalija; Kirilova, Jelena; Kurjane, Natalja; Bruvere, Ruta; Kesters, Andris; Kizane, Gunta; Kirilovs, Georgijs; Meirovics, Imants
2007-11-01
ABM (3-aminobenzanthrrone derivative) developed at the Riga Technical University, Riga, Latvia) has been previously shown as a potential probe for determination of the immune state of patients with different pathologies . The fist study (using probe ABM) of peripheral blood mononuclear cells (PBMC) membranes of 97 Chernobyl clean-up workers from Latvia was conducted in 1997. Now we repeatedly examine the same (n = 54) individuals in dynamics. ABM spectral parameters in PBMC suspension, fluorescence anisotropy and blood plasma albumin characteristics were recorded. In 1997 screening showed 5 different patterns of fluorescence spectra, from which in 2007 we obtained only two. These patterns of spectra had never been previously seen in healthy individuals or patients with tuberculosis, multiple sclerosis, rheumatoid arthritis, etc., examined by us. Patterns of ABM fluorescence spectra are associated with membrane anisotropy and conformational changes of blood plasma albumin. We observed that in dynamics 1997-2007 the lipid compartment of the membrane became more fluid while the lipid-protein interface became more rigid. The use of probe ANS and albumin auto-fluorescence allowed show conformational alterations in Chernobyl clean-up workers blood plasma. It is necessary to note that all investigated parameters significantly differ in observed groups of patients. These findings reinforce our understanding that that the cell membrane is a significant biological target of radiation. The role of the membrane in the expression and course of cell damage after radiation exposure must be considered. So ten years dynamic of PBMC membrane characteristics by ABM (spectral shift and anisotropy indexes) in Chernobyl clean-up workers reveal progressive trend toward certain resemblance with those of chronic B-cell lymphoid leukemia.
Surface passivation of InGaP/GaAs HBT using silicon-nitride film deposited by ECR CVD plasma
NASA Astrophysics Data System (ADS)
Manera, L. T.; Zoccal, L. B.; Diniz, J. A.; Tatsch, P. J.; Doi, I.
2008-07-01
In this paper we have developed a passivation technique with silicon-nitride (SiN X) film that requires no surface pre-treatment, and is fully compatible to monolithic microwave integrated circuits (MMICs). The nitride depositions were carried out by ECR-CVD (electron cyclotron resonance-chemical vapor deposition) directly over InGaP/GaAs heterojunction structures, which are used for heterojunction bipolar transistors (HBTs). Optical emission spectrometry (OES) was used for plasma characterization, and low formation of H and NH molecules in the gas phase was detected at pressure of 2.5 mTorr. These molecules can degrade III-V semiconductor surfaces due to the preferential loss of As or P and hydrogen incorporation at the substrate. The substrates were cleaned with organic solvents using a Sox-let distillate. The ECR depositions were carried out at a fixed substrate temperature of 20 °C, SiH 4/N 2 flow ratio of 1, Ar flow of 5 sccm pressure of 2.5 mTorr and microwave (2.45 GHz) power of 250 W and RF (13.56 MHz) power of 4 W. We have applied this film for InGaP/GaAs HBT fabrication process with excellent results, where two major contribuiton is related to this passivation technique, the enhancement in the transistor dc gain β and the improvement in the signal-to-noise ratio when compared unpassivated and passivated devices.
NASA Technical Reports Server (NTRS)
Trigwell, Steve; Boucher, Derrick; Calle, Carlos
2006-01-01
The use of an atmospheric pressure glow discharge (APGD) plasma was used at KSC to increase the hydrophilicity of spaceport materials to enhance their surface charge dissipation and prevent possible ESD in spaceport operations. Significant decreases in charge decay times were observed after tribocharging the materials using the standard KSC tribocharging test. The polarity and amount of charge transferred was dependent upon the effective work function differences between the respective materials. In this study, polyethylene (PE) and polytetrafluoroethylene (PTFE) were exposed to a He+O2 APGD. The pre and post treatment surface chemistry was analyzed by X-ray photoelectron spectroscopy and contact angle measurements. Semi-empirical and ab initio calculations were performed to correlate the experimental results with some plausible molecular and electronic structure features of the oxidation process. For the PE, significant surface oxidation was observed, as indicated by XPS showing C-O, C=O, and O-C=O bonding, and a decrease in the surface contact angle from 98.9 deg to 61.2 deg. For the PTFE, no C-O bonding appeared and the surface contact angle increased indicating the APGD only succeeded in cleaning the PTFE surface without affecting the surface structure. The calculations using the PM3 and DFT methods were performed on single and multiple oligomers to simulate a wide variety of oxidation scenarios. Calculated work function results suggest that regardless of oxidation mechanism, e.g. -OH, =0 or a combination thereof, the experimentally observed levels of surface oxidation are unlikely to lead to a significant change in the electronic structure of PE and that its increased hydrophilic properties are the primary reason for the observed changes in its electrostatic behavior. The calculations for PTFE argue strongly against significant oxidation of that material, as confirmed by the XPS results.
The Relationship of the Silicon Surface Roughness and Gate Oxide Integrity in NH4OH/H2O2 Mixtures
NASA Astrophysics Data System (ADS)
Meuris, M.; Verhaverbeke, S.; Mertens, P. W.; Heyns, M. M.; Hellemans, L.; Bruynseraede, Y.; Philipossian, A.
1992-11-01
In this study some recent findings on the cleaning action of the NH4OH/H2O2 (SC1) step in a pre-gate oxidation cleaning (RCA cleaning) are given. An important parameter in this mixture is the NH4OH/H2O2 ratio. The Fe contamination on the silicon surface after this cleaning step is found to increase upon decreasing the NH4OH/H2O2 ratio. This can be attributed to the incorporation of Fe in the chemical oxide, grown by the hydrogen peroxide. The particle removal efficiency of the cleaning step is found to decrease upon decreasing the NH4OH/H2O2 ratio. On the other hand, using a lower NH4OH concentration results in a less severe silicon surface roughening. It is demonstrated in this study that the NH4OH/H2O2 ratio during the SC1 step of the cleaning is the determining parameter for the breakdown properties of a gate oxide. A (0.25/1/5) NH4OH/H2O2/H2O mixture at 75°C in our experimental conditions is suggested to be the best compromise between particle removal and surface roughness during the SC1 step.
DOE Office of Scientific and Technical Information (OSTI.GOV)
Reece, Charles E.; Ciancio, Elizabeth J.; Keyes, Katharine A.
2009-11-01
Particulate contamination on the surface of SRF cavities limits their performance via the enhanced generation of field-emitted electrons. Considerable efforts are expended to actively clean and avoid such contamination on niobium surfaces. The protocols in active use have been developed via feedback from cavity testing. This approach has the risk of over-conservatively ratcheting an ever increasing complexity of methods tied to particular circumstances. A complementary and perhaps helpful approach is to quantitatively assess the effectiveness of candidate methods at removing intentional representative particulate contamination. Toward this end, we developed a standardized contamination protocol using water suspensions of Nb{sub 2}O{sub 5}more » and SS 316 powders applied to BCP’d surfaces of standardized niobium samples yielding particle densities of order 200 particles/mm{sup 2}. From these starting conditions, controlled application of high pressure water rinse, ultrasonic cleaning, or CO{sub 2} snow jet cleaning was applied and the resulting surfaces examined via SEM/scanning EDS with particle recognition software. Results of initial parametric variations of each will be reported.« less
Nanostructured Gd3+-TiO2 surfaces for self-cleaning application
NASA Astrophysics Data System (ADS)
Saif, M.; El-Molla, S. A.; Aboul-Fotouh, S. M. K.; Ibrahim, M. M.; Ismail, L. F. M.; Dahn, Douglas C.
2014-06-01
Preparation of self-cleaning surfaces based on lanthanide modified titanium dioxide nanoparticles has rarely been reported. In the present work, gadolinium doped titanium dioxide thin films (x mol Gd3+-TiO2 where x = 0.000, 0.005, 0.008, 0.010, 0.020 and 0.030 mol) were synthesized by sol-gel method and deposited using doctor-blade method. These films were characterized by studying their structural, optical and electrical properties. Doping with gadolinium decreases the band gap energy and increase conductivity of thin films. The photo self-cleaning activity in term of quantitative determination of the active oxidative species (rad OH) produced on the thin film surfaces was evaluated using fluorescent probe method. The results show that, the highly active thin film is the 0.020 Gd3+-TiO2. The structural, morphology, optical, electrical and photoactivity properties of Gd3+-TiO2 thin films make it promising surfaces for self-cleaning application. Mineralization of commercial textile dye (Remazol Red RB-133, RR) and durability using 0.020Gd3+-TiO2 film surface was studied.
An investigation of the normal momentum transfer for gases on tungsten
NASA Technical Reports Server (NTRS)
Moskal, E. J.
1971-01-01
The near monoenergetic beam of neutral helium and argon atoms impinged on a single crystal tungsten target, with the (100) face exposed to the beam. The target was mounted on a torsion balance. The rotation of this torsion balance was monitored by an optical lever, and this reading was converted to a measurement of the momentum exchange between the beam and the target. The tungsten target was flashed to a temperature in excess of 2000 C before every clean run, and the vacuum levels in the final chamber were typically between 0.5 and 1 ntorr. The momentum exchange for the helium-tungsten surface and the argon-tungsten surface combination was obtained over approximately a decade of incoming energy (for the argon gas) at angles of incidence of 0, 30, and 41 deg on both clean and dirty (gas covered) surfaces. The results exhibited a significant variation in momentum transfer between the data obtained for the clean and dirty surfaces. The values of normal momentum accommodation coefficient for the clean surface were found to be lower than the values previously reported.
Woltering, R; Hoffmann, G; Isermann, J; Heudorf, U
2016-11-01
Background and Objective: An assessment of cleaning and disinfection in hospitals by the use of objective surveillance and review of mandatory corrective measures was undertaken. Methods: A prospective examination of the cleaning and disinfection of surfaces scheduled for daily cleaning in 5 general care hospitals by use of an ultraviolet fluorescence targeting method (UVM) was performed, followed by structured educational and procedural interventions. The survey was conducted in hospital wards, operating theatres and intensive care units. Cleaning performance was measured by complete removal of UVM. Training courses and reinforced self-monitoring were implemented after the first evaluation. 6 months later, we repeated the assessment for confirmation of success. Results: The average cleaning performance was 34% (31/90) at base-line with significant differences between the 5 hospitals (11-67%). The best results were achieved in intensive care units (61%) and operating theatres (58%), the worst results in hospital wards (22%). The intervention significantly improved cleaning performance up to an average of 69% (65/94; +34.7%; 95% confidence interval (CI): 21.2-48.3; p<0.05), with differences between the hospitals (20-95%). The largest increase was achieved in hospital wards (+45%; CI 29.2-60.8; p<0.05). Improvements in operating theatres (+22.9%; CI 10.9-56.7) and intensive care units (+5.6%; CI 25.8-36.9) were statistically not significant. Conclusions: The monitoring of cleaning and disinfection of surfaces by fluorescence targeting is appropriate for evaluating hygiene regulations. An intervention can lead to a significant improvement of cleaning performance. As part of a strategy to improve infection control in hospitals, fluorescence targeting enables a simple inexpensive and effective surveillance of the cleaning performance and corrective measures. © Georg Thieme Verlag KG Stuttgart · New York.
NASA Astrophysics Data System (ADS)
AlShaer, A. W.; Li, L.; Mistry, A.
2014-12-01
Laser welding of aluminium alloys typically results in porosity in the fusion zones, leading to poor mechanical and corrosion performances. Mechanical and chemical cleaning of surfaces has been used previously to remove contaminants for weld joint preparations. However, these methods are slow, ineffective (e.g. due to hydrogen trapping) or lead to environmental hazards. This paper reports the effects of short pulsed laser surface cleaning on porosity formation and reduction in laser welding of AC-170PX (AA6014) aluminium sheets (coated with Ti/Zr and lubricated using a dry lubricant AlO70) with two types of joints: fillet edge and flange couch, using an AA4043 filler wire for automotive component assembly. The effect of laser cleaning on porosity reduction during laser welding using a filler wire has not been reported before. In this work, porosity and weld fusion zone geometry were examined prior to and after laser cleaning. The nanosecond pulsed Nd:YAG laser cleaning was found to reduce porosity significantly in the weld fusion zones. For the fillet edge welds, porosity was reduced to less than 0.5% compared with 10-80% without laser cleaning. For flange couch welds, porosity was reduced to 0.23-0.8% with laser cleaning from 0.7% to 4.3% without laser cleaning. This has been found to be due to the elimination of contaminations and oxide layers that contribute to the porosity formation. The laser cleaning is based on thermal ablation. This research focuses on porosity reduction in laser welding of aluminium alloy. Weld quality was investigated for two joints, fillet edge and flange couch joints. The effect of laser cleaning on porosity reduction after welding was investigated. It was found that laser cleaning reduced porosity less than 1% in both joints. Weld dimensions and strength were evaluated and discussed for both types of joints.
Wong, Swee Siang; Huang, Cheng Hua; Yang, Chiu Chu; Hsieh, Yi Pei; Kuo, Chen Ni; Chen, Yi Ru; Chen, Li Ching
2018-01-01
Environmental cleaning is a fundamental principle of infection control in health care settings. We determined whether implementing separated environmental cleaning management measures in MICU reduced the density of HAI. We performed a 4-month prospective cohort intervention study between August and December 2013, at the MICU of Cathay General hospital. We arranged a training program for all the cleaning staff regarding separated environmental cleaning management measures by using disposable wipes of four colors to clean the patients' bedside areas, areas at a high risk of contamination, paperwork areas, and public areas. Fifteen high-touch surfaces were selected for cleanliness evaluation by using the adenosine triphosphate (ATP) bioluminescence test. Then data regarding HAI densities in the MICU were collected during the baseline, intervention, and late periods. A total of 120 ATP readings were obtained. The total number of clean high-touch surfaces increased from 13% to 53%, whereas that of unclean high-touch surface decreased from 47% to 20%. The densities of HAI were 14.32‰ and 14.90‰ during the baseline and intervention periods, respectively. The HAI density did not decrease after the intervention period, but it decreased to 9.07‰ during the late period. Implementing separated environmental cleaning management measures by using disposable wipes of four colors effectively improves cleanliness in MICU environments. However, no decrease in HAI density was observed within the study period. Considering that achieving high levels of hand-hygiene adherence is difficult, improving environmental cleaning is a crucial adjunctive measure for reducing the incidence of HAIs.
Shear strength of metal-sapphire contacts
NASA Technical Reports Server (NTRS)
Pepper, S. V.
1976-01-01
The shear strength of polycrystalline Ag, Cu, Ni, and Fe contacts on clean (0001) sapphire has been studied in ultrahigh vacuum. Both clean metal surfaces and surfaces exposed to O2, Cl2, and C2H4 were used. The results indicate that there are two sources of strength of Al2O3-metal contacts: an intrinsic one that depends on the particular clean metal in contact with Al2O3 and an additional one due to intermediate films. The shear strength of the clean metal contacts correlated directly with the free energy of oxide formation for the lowest metal oxide, in accord with the hypothesis that a chemical bond is formed between metal cations and oxygen anions in the sapphire surface. Contacts formed by metals exposed to chlorine exhibited uniformly low shear strength indicative of van der Waals bonding between chlorinated metal surfaces and sapphire. Contacts formed by metals exposed to oxygen exhibited enhanced shear strength, in accord with the hypothesis that an intermediate oxide layer increases interfacial strength.
Abrasive blast cleaning method for the renewal of worn-out acceleration tubes
NASA Astrophysics Data System (ADS)
Bartha, L.; Koltay, E.; Mórik, Gy.
1996-04-01
The degradation of the electrical properties of acceleration tubes emerging with performance time is known to be assigned mainly to impurities and surface breakdown tracks appearing on the inner surface of the insulators. Consequently, a radical treatment for removing the surface layer may result in a renewal of the tube. An abrasive blast cleaning procedure has been used on a set of worn-out acceleration tube units. The cleaned tube exhibited its original electrical characteristics and it has been used for more than 4000 h of operation up to the maximum rated voltage of our 5 MV electrostatic accelerator without any observable degradation. XRF and PIXE analytical measurements performed on used and blast-treated insulators as well as on electrode and pump oil samples reveal the contribution of elementary processes in the acceleration tube to the ageing of the tube and indicate the effectness of the blasting process used for the re-establishment of clean surface conditions.
NASA Technical Reports Server (NTRS)
Napier, Mary E.; Stair, Peter C.
1992-01-01
Polymeric perfluoroalkylethers are being considered for use as lubricants in high temperature applications, but have been observed to catalytically decompose in the presence of metals. X-ray photoelectron spectroscopy (XPS) and temperature programmed desorption (TPD) were used to explore the decomposition of three model fluorinated ethers on clean polycrystalline iron surfaces and iron surfaces chemically modified with oxygen. Low temperature adsorption of the model fluorinated ethers on the clean, oxygen modified and oxidized iron surfaces was molecular. Thermally activated defluorination of the three model compounds was observed on the clean iron surface at remarkably low temperatures, 155 K and below, with formation of iron fluoride. Preferential C-F bond scission occurred at the terminal fluoromethoxy, CF3O, of perfluoro-1-methoxy-2-ethoxy ethane and perfluoro-1-methoxy-2-ethoxy propane and at CF3/CF2O of perfluoro-1,3-diethoxy propane. The reactivity of the clean iron toward perfluoroalkylether decomposition when compared to other metals is due to the strength of the iron fluoride bond and the strong electron donating ability of the metallic iron. Chemisorption of an oxygen overlayer lowered the reactivity of the iron surface to the adsorption and decomposition of the three model fluorinated ethers by blocking active sites on the metal surface. Incomplete coverage of the iron surface with chemisorbed oxygen results in a reaction which resembles the defluorination reaction observed on the clean iron surface. Perfluoro-1-methoxy-2-ethoxy ethane reacts on the oxidized iron surface at 138 K, through a Lewis acid assisted cleavage of the carbon oxygen bond, with preferential attack at the terminal fluoromethoxy, CF3O. The oxidized iron surface did not passivate, but became more reactive with time. Perfluoro-1-methoxy-2-ethoxy propane and perfluoro-1,3-diethoxy propane desorbed prior to the observation of decomposition on the oxidized iron surface.
Monitoring and improving the effectiveness of surface cleaning and disinfection.
Rutala, William A; Weber, David J
2016-05-02
Disinfection of noncritical environmental surfaces and equipment is an essential component of an infection prevention program. Noncritical environmental surfaces and noncritical medical equipment surfaces may become contaminated with infectious agents and may contribute to cross-transmission by acquisition of transient hand carriage by health care personnel. Disinfection should render surfaces and equipment free of pathogens in sufficient numbers to prevent human disease (ie, hygienically clean). Copyright © 2016 Association for Professionals in Infection Control and Epidemiology, Inc. Published by Elsevier Inc. All rights reserved.
2015-01-01
PURPOSE To describe and characterize the surface topography and cleanliness of CAD/CAM manufactured zirconia abutments after steaming and ultrasonic cleaning. MATERIALS AND METHODS A total of 12 ceramic CAD/CAM implant abutments of various manufacturers were produced and randomly divided into two groups of six samples each (control and test group). Four two-piece hybrid abutments and two one-piece abutments made of zirconium-dioxide were assessed per each group. In the control group, cleaning by steam was performed. The test group underwent an ultrasonic cleaning procedure with acetone, ethyl alcohol and antibacterial solution. Groups were subjected to scanning electron microscope (SEM) analysis and Energy-dispersive X-ray spectroscopy (EDX) to verify and characterize contaminant chemical characterization non-quantitatively. RESULTS All zirconia CAD/CAM abutments in the present study displayed production-induced wear particles, debris as well as organic and inorganic contaminants. The abutments of the test group showed reduction of surface contamination after undergoing an ultrasonic cleaning procedure. However, an absolute removal of pollutants could not be achieved. CONCLUSION The presence of debris on the transmucosal surface of CAD/CAM zirconia abutments of various manufacturers was confirmed. Within the limits of the study design, the results suggest that a defined ultrasonic cleaning process can be advantageously employed to reduce such debris, thus, supposedly enhancing soft tissue healing. Although the adverse long-term influence of abutment contamination on the biological stability of peri-implant tissues has been evidenced, a standardized and validated polishing and cleaning protocol still has to be implemented. PMID:25932314
First principles study of gallium cleaning for hydrogen-contaminated α-Al2O3(0001) surfaces.
Yang, Rui; Rendell, Alistair P
2013-05-15
The use of gallium for cleaning hydrogen-contaminated Al2O3 surfaces is explored by performing first principles density functional calculations of gallium adsorption on a hydrogen-contaminated Al-terminated α-Al2O3(0001) surface. Both physisorbed and chemisorbed H-contaminated α-Al2O3(0001) surfaces with one monolayer (ML) gallium coverage are investigated. The thermodynamics of gallium cleaning are considered for a variety of different asymptotic products, and are found to be favorable in all cases. Physisorbed H atoms have very weak interactions with the Al2O3 surface and can be removed easily by the Ga ML. Chemisorbed H atoms form stronger interactions with the surface Al atoms. Bonding energy analysis and departure simulations indicate, however, that chemisorbed H atoms can be effectively removed by the Ga ML. Copyright © 2013 Wiley Periodicals, Inc.
NASA Astrophysics Data System (ADS)
Saldana, Tiffany; McGarvey, Steve; Ayres, Steve
2014-04-01
The continual increasing demands upon Plasma Etching systems to self-clean and continue Plasma Etching with minimal downtime allows for the examination of SiCN, SiO2 and SiN defectivity based upon Surface Scanning Inspection Systems (SSIS) wafer scan results. Historically all Surface Scanning Inspection System wafer scanning recipes have been based upon Polystyrene Spheres wafer deposition for each film stack and the subsequent creation of light scattering sizing response curves. This paper explores the feasibility of the elimination of Polystyrene Latex Sphere (PSL) and/or process particle deposition on both filmed and bare Silicon wafers prior to Surface Scanning Inspection System recipe creation. The study will explore the theoretical maximal Surface Scanning Inspection System sensitivity based on PSL recipe creation in conjunction with the maximal sensitivity derived from Bidirectional Reflectance Distribution Function (BRDF) maximal sensitivity modeling recipe creation. The surface roughness (Root Mean Square) of plasma etched wafers varies dependent upon the process film stack. Decrease of the root mean square value of the wafer sample surface equates to higher surface scanning inspection system sensitivity. Maximal sensitivity SSIS scan results from bare and filmed wafers inspected with recipes created based upon Polystyrene/Particle Deposition and recipes created based upon BRDF modeling will be overlaid against each other to determine maximal sensitivity and capture rate for each type of recipe that was created with differing recipe creation modes. A statistically valid sample of defects from each Surface Scanning Inspection system recipe creation mode and each bare wafer/filmed substrate will be reviewed post SSIS System processing on a Defect Review Scanning Electron Microscope (DRSEM). Native defects, Polystyrene Latex Spheres will be collected from each statistically valid defect bin category/size. The data collected from the DRSEM will be utilized to determine the maximum sensitivity capture rate for each recipe creation mode. Emphasis will be placed upon the sizing accuracy of PSL versus BRDF modeling results based upon automated DRSEM defect sizing. An examination the scattering response for both Mie and Rayleigh will be explored in relationship to the reported sizing variance of the SSIS to make a determination of the absolute sizing accuracy of the recipes there were generated based upon BRDF modeling. This paper explores both the commercial and technical considerations of the elimination of PSL deposition as a precursor to SSIS recipe creation. Successful integration of BRDF modeling into the technical aspect of SSIS recipe creation process has the potential to dramatically reduce the recipe creation timeline and vetting period. Integration of BRDF modeling has the potential to greatly reduce the overhead operation costs for High Volume Manufacturing sites by eliminating the associated costs of third party PSL deposition.
Surface etching technologies for monocrystalline silicon wafer solar cells
NASA Astrophysics Data System (ADS)
Tang, Muzhi
With more than 200 GW of accumulated installations in 2015, photovoltaics (PV) has become an important green energy harvesting method. The PV market is dominated by solar cells made from crystalline silicon wafers. The engineering of the wafer surfaces is critical to the solar cell cost reduction and performance enhancement. Therefore, this thesis focuses on the development of surface etching technologies for monocrystalline silicon wafer solar cells. It aims to develop a more efficient alkaline texturing method and more effective surface cleaning processes. Firstly, a rapid, isopropanol alcohol free texturing method is successfully demonstrated to shorten the process time and reduce the consumption of chemicals. This method utilizes the special chemical properties of triethylamine, which can form Si-N bonds with wafer surface atoms. Secondly, a room-temperature anisotropic emitter etch-back process is developed to improve the n+ emitter passivation. Using this method, 19.0% efficient screen-printed aluminium back surface field solar cells are developed that show an efficiency gain of 0.15% (absolute) compared with conventionally made solar cells. Finally, state-of-the-art silicon surface passivation results are achieved using hydrogen plasma etching as a dry alternative to the classical hydrofluoric acid wet-chemical process. The effective native oxide removal and the hydrogenation of the silicon surface are shown to be the reasons for the excellent level of surface passivation achieved with this novel method.
Mossotti, Victor G.; Eldeeb, A. Raouf; Fries, Terry L.; Coombs, Mary Jane; Naude, Virginia N.; Soderberg, Lisa; Wheeler, George S.
2002-01-01
This report describes a scientific investigation of the effects of eight different cleaning techniques on the Berkshire Lee marble component of the facade of the East Center Pavilion at Philadelphia City Hall; the study was commissioned by the city of Philadelphia. The eight cleaning techniques evaluated in this study were power wash (proprietary gel detergent followed by water rinse under pressure), misting (treatment with potable, nebulized water for 24-36 hours), gommage (proprietary Thomann-Hanry low-pressure, air-driven, small-particle, dry abrasion), combination (gommage followed by misting), Armax (sodium bicarbonate delivered under pressure in a water wash), JOS (dolomite powder delivered in a low-pressure, rotary-vortex water wash), laser (thermal ablation), and dry ice (powdered-dry-ice abrasion delivered under pressure). In our study approximately 160 cores were removed from the building for laboratory analysis. We developed a computer program to analyze scanning-electron-micrograph images for the microscale surface roughness and other morphologic parameters of the stone surface, including the near-surface fracture density of the stone. An analysis of more than 1,100 samples cut from the cores provided a statistical basis for crafting the essential elements of a reduced-form, mixed-kinetics conceptual model that represents the deterioration of calcareous stone in terms of self-organized soiling and erosion patterns. This model, in turn, provided a basis for identifying the variables that are affected by the cleaning techniques and for evaluating the extent to which such variables influence the stability of the stone. The model recognizes three classes of variables that may influence the soiling load on the stone, including such exogenous environmental variables as airborne moisture, pollutant concentrations, and local aerodynamics, and such endogenous stone variables as surface chemistry and microstructure (fracturing, roughness, and so on). This study showed that morphologic variables on the mesoscale to macroscale are not generally affected by the choice of a cleaning technique. The long-term soiling pattern on the building is independent of the cleaning technique applied. This study also showed that soluble salts do not play a significant role in the deterioration of Berkshire Lee marble. Although salts were evident in cracks and fissures of the heavily soiled stone, such salts did not penetrate the surface to a depth of more than a few hundred micrometers. The criteria used to differentiate the cleaning techniques were ultimately based on the ability of each technique to remove soiling without altering the texture of the stone surface. This study identified both the gommage and JOS techniques as appropriate for cleaning ashlar surfaces and the combination technique as appropriate for cleaning highly carved surfaces at the entablatures, cornices, and column capitals.
In Vitro Analysis of Fibronectin-Modified Titanium Surfaces
Chang, Yu-Chi; Lee, Wei-Fang; Feng, Sheng-Wei; Huang, Haw-Ming; Lin, Che-Tong; Teng, Nai-Chia; Chang, Wei Jen
2016-01-01
Background Glow discharge plasma (GDP) procedure is an effective method for grafting various proteins, including albumin, type I collagen, and fibronectin, onto a titanium surface. However, the behavior and impact of titanium (Ti) surface modification is yet to be unraveled. Purpose The purpose of this study is to evaluate and analyze the biological properties of fibronectin-grafted Ti surfaces treated by GDP. Materials and Methods Grade II Ti discs were initially cleaned and autoclaved to obtain original specimens. Subsequently, the specimens were GDP treated and grafted with fibronectin to form Ar-GDP (Argon GDP treatment only) and GDP-fib (fibronectin coating following GDP treatment) groups. Blood coagulation test and MG-63 cell culture were performed to evaluate the biological effects on the specimen. Results There was no significant difference between Ar-GDP and GDP-fib groups in blood compatibility analysis. While in the MTT test, cellular proliferation was benefited from the presence of fibronectin coating. The numbers of cells on Ar-GDP and GDP-fib specimens were greater than those in the original specimens after 24 h of culturing. Conclusions GDP treatment combined with fibronectin grafting favored MG-63 cell adhesion, migration, and proliferation on titanium surfaces, which could be attributed to the improved surface properties. PMID:26731536
Hopman, Joost; Donskey, Curtis J; Boszczowski, Icaro; Alfa, Michelle J
2018-05-23
The efficacy of discharge cleaning and disinfection of high-touch surfaces of intensive care unit patient rooms in Brazil, Canada, the Netherlands, and the United States was evaluated and the effect of an educational intervention was determined. Significant site-to-site differences in cleaning regimens and baseline cleanliness levels were observed using ATP levels, colony-forming units, and reflective surface marker removal percent pass rates. An educational intervention that includes rapid feedback of the ATP measurements could significantly improve the quality of the cleaning and disinfection regimens. Copyright © 2018 Association for Professionals in Infection Control and Epidemiology, Inc. All rights reserved.
Manian, Farrin A; Griesnauer, Sandra; Senkel, Diane
2013-04-01
Quantitative broth cultures were obtained from hospital rooms newly vacated by patients positive for multidrug-resistant Acinetobacter baumannii complex (ABC) before and after terminal cleaning and disinfection. Of 10 ABC-positive precleaned room surfaces, 6 (60%) remained culture-positive after terminal cleaning and disinfection. Of a total of 16 room surfaces with detectable ABC by the quantitative method, 5 (31.2%; 95% confidence interval, 13.9%-55.8%) were also culture-positive by the qualitative technique. Copyright © 2013 Association for Professionals in Infection Control and Epidemiology, Inc. Published by Mosby, Inc. All rights reserved.
Flows, strains, and the formation of joints in oblique collision of metal plates
NASA Astrophysics Data System (ADS)
Shtertser, A. A.; Zlobin, B. S.
2015-09-01
The processes of high-velocity oblique collision of metal plates which lead to the formation of their joints (seizure) are considered. It is found that the cleaning of the plate surface necessary for seizure results from a jet flow (particle stream), whose source is at least one of the welded materials or an interlayer of ductile material located in the initial region of collision. It is shown that additional cleaning may occur due to the emergence of rotating microregions in intense gradient flows localized in the joint area; seizure on cleaned surfaces is due to reduction of the surface energy of the system.
Memorandum: Improving EPA Review of Appalachian Surface Coal Mining Operations Under the Clean Water Act, National Environmental Policy Act, and the Environmental Justice Executive Order, July 21, 2011
40 CFR 60.255 - Performance tests and other compliance requirements.
Code of Federal Regulations, 2010 CFR
2010-07-01
... Transfer Network (TTN) under Emission Measurement Center Preliminary Methods. The monitoring plan approved... be recorded and quantified. The optical surfaces exposed to the effluent gases must be cleaned prior... adjustments. For systems using automatic zero adjustments, the optical surfaces must be cleaned when the...
NASA Astrophysics Data System (ADS)
Sasaki, Takehiko; Itai, Yuichiro; Iwasawa, Yasuhiro
1999-12-01
Decomposition processes of methanol on clean and oxygen-precovered Ru(001) surfaces have been visualized in real time with a temperature-programmed (TP) electron-stimulated desorption ion angular distribution (ESDIAD)/time-of-flight (TOF) system. The mass of desorbed ions during temperature-programmed surface processes was identified by TOF measurements. In the case of methanol (CH 3OD) adsorption on Ru(001)-p(2×2)-O, a halo pattern of H + from the methyl group of methoxy species was observed at 100-200 K, followed by a broad pattern from the methyl group at 230-250 K and by a near-center pattern from O + ions originating from adsorbed CO above 300 K. The halo pattern is attributed to a perpendicular conformation of the CO bond axis of the methoxy species, leading to off-normal CH bond scission. On the other hand, methanol adsorbed on clean Ru(001) did not give any halo pattern but a broad pattern was observed along the surface normal, indicating that the conformation of the methoxy species is not ordered on the clean surface. Comparison between the ESDIAD images of the oxygen-precovered surface and the clean surface suggests that the precovered oxygen adatoms induce ordering of the methoxy species. Real-time ESDIAD measurements revealed that the oxygen atoms at the Ru(001)-p(2×2)-O surface have a positive effect on selective dehydrogenation of the methoxy species to CO+H 2 and a blocking effect on CO bond breaking of the methoxy species.
Kampf, Günter; Degenhardt, Stina; Lackner, Sibylle; Ostermeyer, Christiane
2014-01-01
Background: It has recently been reported that reusable dispensers for surface disinfection tissues may be contaminated, especially with adapted Achromobacter species 3, when products based on surface-active ingredients are used. Fresh solution may quickly become recontaminated if dispensers are not processed adequately. Methods: We evaluated the abilities of six manual and three automatic processes for processing contaminated dispensers to prevent recolonisation of a freshly-prepared disinfectant solution (Mikrobac forte 0.5%). Dispensers were left at room temperature for 28 days. Samples of the disinfectant solution were taken every 7 days and assessed quantitatively for bacterial contamination. Results: All automatic procedures prevented recolonisation of the disinfectant solution when a temperature of 60–70°C was ensured for at least 5 min, with or without the addition of chemical cleaning agents. Manual procedures prevented recontamination of the disinfectant solution when rinsing with hot water or a thorough cleaning step was performed before treating all surfaces with an alcohol-based disinfectant or an oxygen-releaser. Other cleaning and disinfection procedures, including the use of an alcohol-based disinfectant, did not prevent recolonisation. Conclusions: These results indicate that not all processes are effective for processing reusable dispensers for surface-disinfectant tissues, and that a high temperature during the cleaning step or use of a biofilm-active cleaning agent are essential. PMID:24653973
Low-Temperature Silicon Epitaxy by Remote, Plasma - Chemical Vapor Deposition
NASA Astrophysics Data System (ADS)
Habermehl, Scott Dwight
The dynamics of low temperature Si homoepitaxial and heteroepitaxial growth, by remote plasma enhanced chemical vapor deposition, RPECVD, have been investigated. For the critical step of pre-deposition surface preparation of Si(100) surfaces, the attributes of remote plasma generated atomic H are compared to results obtained with a rapid thermal desorption, RTD, technique and a hybrid H-plasma/RTD technique. Auger electron spectroscopy, AES, and electron diffraction analysis indicate the hybrid technique to be very effective at surface passivation, while the RTD process promotes the formation of SiC precipitates, which induce defective epitaxial growth. For GaP and GaAs substrates, the use of atomic H exposure is investigated as a surface passivation technique. AES shows this technique to be effective at producing atomically clean surfaces. For processing at 400^circrm C, the GaAs(100) surface is observed to reconstruct to a c(8 x 2)Ga symmetry while, at 530^ circrm C the vicinal GaP(100) surface, miscut 10^circ , is observed to reconstruct to a (1 x n) type symmetry; an unreconstructed (1 x 1) symmetry is observed for GaP(111). Differences in the efficiency with which native oxides are removed from the surface are attributed to variations in the local atomic bonding order of group V oxides. The microstructure of homoepitaxial Si films, deposited at temperatures of 25-450^circ rm C and pressures of 50-500 mTorr, is catalogued. Optimized conditions for the deposition of low defect, single crystal films are identified. The existence of two pressure dependent regimes for process activation are observed. In-situ mass spectral analysis indicates that the plasma afterglow is dominated by monosilane ions below 200 mTorr, while above 200 mTorr, low mass rm H_{x} ^+ (x = 1,2,3) and rm HHe^+ ions dominate. Consideration of the growth rate data indicates that downstream dissociative silane ionization, in the lower pressure regime, is responsible for an enhanced surface H abstraction rate. The observed increase in growth rate is concluded to be a manifestation of increased deposition site activation, resulting from the enhanced H abstraction mechanism. Secondary ion mass spectrometry measurements, of H incorporation in the Si films, yield an "effective" activation energy for the abstraction of surface H. A shift in the activation energy between 50 mTorr (0.7 eV) and 500 mTorr (0.3 eV) supports the conclusions for an ion-induced H abstraction mechanism. From this, a chemical sputtering reaction is proposed, whereby impinging ions react with chemisorbed H to form volatile species. Heteroepitaxial Si thin films are deposited upon GaP and GaAs surfaces. AES is used to evaluate the growth mode of Si on GaP(111) and vicinal GaP(100). In both instances, the data indicates a modified layer-plus-island growth mechanism, with possible interfacial alloy mixing. High quality epitaxial growth is observed to proceed on vicinal GaP(100) surfaces beyond the predicted critical thickness for strain relief of 140 A. For GaP(111), defective structures are observed well below the predicted critical thickness. This discrepancy is attributed to low precursor surface diffusion kinetics that are accommodated by the presence of steps on the vicinal surface. For deposition of Si on GaAs(100), disordered structure is observed within the first few monolayers of growth, which is in agreement with the predicted critical thickness for this system of approximately 10 A.
Plasma-enhanced synthesis of green flame retardant cellulosic materials
NASA Astrophysics Data System (ADS)
Totolin, Vladimir
The natural fiber-containing fabrics and composites are more environmentally friendly, and are used in transportation (automobiles, aerospace), military applications, construction industries (ceiling paneling, partition boards), consumer products, etc. Therefore, the flammability characteristics of the composites based on polymers and natural fibers play an important role. This dissertation presents the development of plasma assisted - green flame retardant coatings for cellulosic substrates. The overall objective of this work was to generate durable flame retardant treatment on cellulosic materials. In the first approach sodium silicate layers were pre-deposited onto clean cotton substrates and cross linked using low pressure, non-equilibrium oxygen plasma. A statistical design of experiments was used to optimize the plasma parameters. The modified cotton samples were tested for flammability using an automatic 45° angle flammability test chamber. Aging tests were conducted to evaluate the coating resistance during the accelerated laundry technique. The samples revealed a high flame retardant behavior and good thermal stability proved by thermo-gravimetric analysis. In the second approach flame retardant cellulosic materials have been produced using a silicon dioxide (SiO2) network coating. SiO 2 network armor was prepared through hydrolysis and condensation of the precursor tetraethyl orthosilicate (TEOS), prior coating the substrates, and was cross linked on the surface of the substrates using atmospheric pressure plasma (APP) technique. Due to protection effects of the SiO2 network armor, the cellulosic based fibers exhibit enhanced thermal properties and improved flame retardancy. In the third approach, the TEOS/APP treatments were extended to linen fabrics. The thermal analysis showed a higher char content and a strong endothermic process of the treated samples compared with control ones, indicating a good thermal stability. Also, the surface analysis proved the existence of the silica-based coatings on all treated cellulosic substrates after intense ultrasound washes. The results obtained in this work allow us to conclude that silica-based coatings used in conjunction with plasma processes have high potential to obtain green flame retardant cellulosic materials with potential applications in the development of upholstered furniture, clothing and military applications.
Friction-induced surface activity of some hydrocarbons with clean and oxide-covered iron
NASA Technical Reports Server (NTRS)
Buckley, D. H.
1973-01-01
Sliding friction studies were conducted on a clean and oxide-covered iron surface with exposure of that surface to various hydrocarbons. The hydrocarbons included ethane, ethylene ethyl chloride, methyl chloride, and vinyl chloride. Auger cylindrical mirror analysis was used to follow interactions of the hydrocarbon with the iron surface. Results with vinyl chloride indicate friction induced surface reactivity, adsorption to surface oxides, friction sensitivity to concentration and polymerization. Variation in the loads employed influence adsorption and accordingly friction. In contrast with ethyl and vinyl chloride, friction induced surface reactivity was not observed with ethane and ethylene.
Davidson, C A; Griffith, C J; Peters, A C; Fielding, L M
1999-01-01
The minimum bacterial detection limits and operator reproducibility of the Biotrace Clean-Tracetrade mark Rapid Cleanliness Test and traditional hygiene swabbing were determined. Areas (100 cm2) of food grade stainless steel were separately inoculated with known levels of Staphylococcus aureus (NCTC 6571) and Escherichia coli (ATCC 25922). Surfaces were sampled either immediately after inoculation while still wet, or after 60 min when completely dry. For both organisms the minimum detection limit of the ATP Clean-Tracetrade mark Rapid Cleanliness Test was 10(4) cfu/100 cm2 (p < 0.05) and was the same for wet and dry surfaces. Both organism type and surface status (i.e. wet or dry) influenced the minimum detection limits of hygiene swabbing, which ranged from 10(2) cfu/100 cm2 to >10(7) cfu/100 cm2. Hygiene swabbing percentage recovery rates for both organisms were less than 0.1% for dried surfaces but ranged from 0.33% to 8.8% for wet surfaces. When assessed by six technically qualified operators, the Biotrace Clean-Tracetrade mark Rapid Cleanliness Test gave superior reproducibility for both clean and inoculated surfaces, giving mean coefficients of variation of 24% and 32%, respectively. Hygiene swabbing of inoculated surfaces gave a mean CV of 130%. The results are discussed in the context of hygiene monitoring within the food industry. Copyright 1999 John Wiley & Sons, Ltd.
9 CFR 3.84 - Cleaning, sanitization, housekeeping, and pest control.
Code of Federal Regulations, 2014 CFR
2014-01-01
... from becoming soiled, and to reduce disease hazards, insects, pests, and odors. Dirt floors, floors..., such as in a mechanical cage washer; (iii) Washing all soiled surfaces with appropriate detergent... same purpose, with a thorough cleaning of the surfaces to remove organic material, so as to remove all...
9 CFR 3.84 - Cleaning, sanitization, housekeeping, and pest control.
Code of Federal Regulations, 2010 CFR
2010-01-01
... from becoming soiled, and to reduce disease hazards, insects, pests, and odors. Dirt floors, floors..., such as in a mechanical cage washer; (iii) Washing all soiled surfaces with appropriate detergent... same purpose, with a thorough cleaning of the surfaces to remove organic material, so as to remove all...
9 CFR 3.84 - Cleaning, sanitization, housekeeping, and pest control.
Code of Federal Regulations, 2011 CFR
2011-01-01
... from becoming soiled, and to reduce disease hazards, insects, pests, and odors. Dirt floors, floors..., such as in a mechanical cage washer; (iii) Washing all soiled surfaces with appropriate detergent... same purpose, with a thorough cleaning of the surfaces to remove organic material, so as to remove all...
9 CFR 3.84 - Cleaning, sanitization, housekeeping, and pest control.
Code of Federal Regulations, 2013 CFR
2013-01-01
... from becoming soiled, and to reduce disease hazards, insects, pests, and odors. Dirt floors, floors..., such as in a mechanical cage washer; (iii) Washing all soiled surfaces with appropriate detergent... same purpose, with a thorough cleaning of the surfaces to remove organic material, so as to remove all...
7 CFR 3201.104 - Metal cleaners and corrosion removers.
Code of Federal Regulations, 2014 CFR
2014-01-01
...) Definition. (1) Products that are designed to clean and remove grease, oil, dirt, stains, soils, and rust..., dirt, stains, and soils from stainless steel surfaces. (iii) Other metal cleaners. Products that are designed to clean and remove grease, oil, dirt, stains, and soils from metal surfaces other than stainless...
9 CFR 3.84 - Cleaning, sanitization, housekeeping, and pest control.
Code of Federal Regulations, 2012 CFR
2012-01-01
... from becoming soiled, and to reduce disease hazards, insects, pests, and odors. Dirt floors, floors..., such as in a mechanical cage washer; (iii) Washing all soiled surfaces with appropriate detergent... same purpose, with a thorough cleaning of the surfaces to remove organic material, so as to remove all...
9 CFR 3.11 - Cleaning, sanitization, housekeeping, and pest control.
Code of Federal Regulations, 2014 CFR
2014-01-01
... prevent an excessive accumulation of feces and food waste, to prevent soiling of the dogs or cats... mechanical cage washer; or (iii) Washing all soiled surfaces with appropriate detergent solutions and... a thorough cleaning of the surfaces to remove organic material, so as to remove all organic material...
9 CFR 3.11 - Cleaning, sanitization, housekeeping, and pest control.
Code of Federal Regulations, 2013 CFR
2013-01-01
... prevent an excessive accumulation of feces and food waste, to prevent soiling of the dogs or cats... mechanical cage washer; or (iii) Washing all soiled surfaces with appropriate detergent solutions and... a thorough cleaning of the surfaces to remove organic material, so as to remove all organic material...
9 CFR 3.11 - Cleaning, sanitization, housekeeping, and pest control.
Code of Federal Regulations, 2012 CFR
2012-01-01
... prevent an excessive accumulation of feces and food waste, to prevent soiling of the dogs or cats... mechanical cage washer; or (iii) Washing all soiled surfaces with appropriate detergent solutions and... a thorough cleaning of the surfaces to remove organic material, so as to remove all organic material...
77 FR 3836 - Supplemental Environmental Impact Statement, Mingo County, WV
Federal Register 2010, 2011, 2012, 2013, 2014
2012-01-25
... Mountain Surface Mine Clean Water Act Section 404 Permit Application. The FHWA and USACE are joint-lead... 2000 FEIS and approved in the 2000 ROD. The USACE is evaluating a Clean Water Act (CWA) Section 404... to surface water and groundwater resources, including aquatic habitat, water quantity and quality...
Cleaning of optical surfaces by excimer laser radiation
NASA Astrophysics Data System (ADS)
Mann, K.; Wolff-Rottke, B.; Müller, F.
1996-04-01
The effect of particle removal from Al mirror surfaces by the influence of pulsed UV laser radiation has been studied. The investigations are closely related to the demands of astronomers, who are looking for a more effective way to clean future very large telescope (VLT) mirrors [1]. A systematic parameter study has been performed in order to determine the irradiation conditions which yield the highest dust removal efficiency (i.e. reflectivity increase) on contaminated samples. The particle removal rate increases with increasing laser fluence, being limited however by the damage threshold of the coating. Data indicate that on Al coated BK7 and Zerodur samples KrF laser radiation yields the optimum result, with cleaning efficiencies comparable to polymer film stripping. The initial reflectivity of the clean coating can nearly be restored, in particular when an additional solvent film on the sample surface is applied.
Anda, G; Dunai, D; Lampert, M; Krizsanóczi, T; Németh, J; Bató, S; Nam, Y U; Hu, G H; Zoletnik, S
2018-01-01
A 60 keV neutral lithium beam system was designed and built up for beam emission spectroscopy measurement of edge plasma on the KSTAR and EAST tokamaks. The electron density profile and its fluctuation can be measured using the accelerated lithium beam-based emission spectroscopy system. A thermionic ion source was developed with a SiC heater to emit around 4-5 mA ion current from a 14 mm diameter surface. The ion optic is following the 2 step design used on other devices with small modifications to reach about 2-3 cm beam diameter in the plasma at about 4 m from the ion source. A newly developed recirculating sodium vapour neutralizer neutralizes the accelerated ion beam at around 260-280 °C even during long (<20 s) discharges. A set of new beam diagnostic and manipulation techniques are applied to allow optimization, aiming, cleaning, and beam modulation. The maximum 60 keV beam energy with 4 mA ion current was successfully reached at KSTAR and at EAST. Combined with an efficient observation system, the Li-beam diagnostic enables the measurement of the density profile and fluctuations on the plasma turbulence time scale.
NASA Astrophysics Data System (ADS)
Cariou, Romain; Chen, Wanghua; Maurice, Jean-Luc; Yu, Jingwen; Patriarche, Gilles; Mauguin, Olivia; Largeau, Ludovic; Decobert, Jean; Roca I Cabarrocas, Pere
2016-05-01
The integration of III-V semiconductors with silicon is a key issue for photonics, microelectronics and photovoltaics. With the standard approach, namely the epitaxial growth of III-V on silicon, thick and complex buffer layers are required to limit the crystalline defects caused by the interface polarity issues, the thermal expansion, and lattice mismatches. To overcome these problems, we have developed a reverse and innovative approach to combine III-V and silicon: the straightforward epitaxial growth of silicon on GaAs at low temperature by plasma enhanced CVD (PECVD). Indeed we show that both GaAs surface cleaning by SiF4 plasma and subsequent epitaxial growth from SiH4/H2 precursors can be achieved at 175 °C. The GaAs native oxide etching is monitored with in-situ spectroscopic ellipsometry and Raman spectroscopy is used to assess the epitaxial silicon quality. We found that SiH4 dilution in hydrogen during deposition controls the layer structure: the epitaxial growth happens for deposition conditions at the transition between the microcrystalline and amorphous growth regimes. SIMS and STEM-HAADF bring evidences for the interface chemical sharpness. Together, TEM and XRD analysis demonstrate that PECVD enables the growth of high quality relaxed single crystal silicon on GaAs.
NASA Astrophysics Data System (ADS)
Anda, G.; Dunai, D.; Lampert, M.; Krizsanóczi, T.; Németh, J.; Bató, S.; Nam, Y. U.; Hu, G. H.; Zoletnik, S.
2018-01-01
A 60 keV neutral lithium beam system was designed and built up for beam emission spectroscopy measurement of edge plasma on the KSTAR and EAST tokamaks. The electron density profile and its fluctuation can be measured using the accelerated lithium beam-based emission spectroscopy system. A thermionic ion source was developed with a SiC heater to emit around 4-5 mA ion current from a 14 mm diameter surface. The ion optic is following the 2 step design used on other devices with small modifications to reach about 2-3 cm beam diameter in the plasma at about 4 m from the ion source. A newly developed recirculating sodium vapour neutralizer neutralizes the accelerated ion beam at around 260-280 °C even during long (<20 s) discharges. A set of new beam diagnostic and manipulation techniques are applied to allow optimization, aiming, cleaning, and beam modulation. The maximum 60 keV beam energy with 4 mA ion current was successfully reached at KSTAR and at EAST. Combined with an efficient observation system, the Li-beam diagnostic enables the measurement of the density profile and fluctuations on the plasma turbulence time scale.
Advanced Curation Protocols for Mars Returned Sample Handling
NASA Astrophysics Data System (ADS)
Bell, M.; Mickelson, E.; Lindstrom, D.; Allton, J.
Introduction: Johnson Space Center has over 30 years experience handling precious samples which include Lunar rocks and Antarctic meteorites. However, we recognize that future curation of samples from such missions as Genesis, Stardust, and Mars S mple Return, will require a high degree of biosafety combined witha extremely low levels of inorganic, organic, and biological contamination. To satisfy these requirements, research in the JSC Advanced Curation Lab is currently focused toward two major areas: preliminary examination techniques and cleaning and verification techniques . Preliminary Examination Techniques : In order to minimize the number of paths for contamination we are exploring the synergy between human &robotic sample handling in a controlled environment to help determine the limits of clean curation. Within the Advanced Curation Laboratory is a prototype, next-generation glovebox, which contains a robotic micromanipulator. The remotely operated manipulator has six degrees-of- freedom and can be programmed to perform repetitive sample handling tasks. Protocols are being tested and developed to perform curation tasks such as rock splitting, weighing, imaging, and storing. Techniques for sample transfer enabling more detailed remote examination without compromising the integrity of sample science are also being developed . The glovebox is equipped with a rapid transfer port through which samples can be passed without exposure. The transfer is accomplished by using a unique seal and engagement system which allows passage between containers while maintaining a first seal to the outside environment and a second seal to prevent the outside of the container cover and port door from becoming contaminated by the material being transferred. Cleaning and Verification Techniques: As part of the contamination control effort, innovative cleaning techniques are being identified and evaluated in conjunction with sensitive cleanliness verification methods. Towards this end, cleaning techniques such as ultrasonication in ultra -pure water (UPW), oxygen (O2) plasma, and carbon dioxide (CO2) "snow" are being used to clean a variety of different contaminants on a variety of different surfaces. Additionally, once cleaned, techniques to directly verify the s rface cleanliness are being developed. Theseu include X ray photoelectron spectroscopy (XPS) quantification, and screening with- contact angle measure ments , which can be correlated with XPS standards. Methods developed in the Advanced Curation Laboratory will determine the extent to which inorganic and biological contamination can be controlled and minimized.