Defectivity control of aluminum chemical mechanical planarization in replacement metal gate process of MOSFET

NASA Astrophysics Data System (ADS)

Jin, Zhang; Yuling, Liu; Chenqi, Yan; Yangang, He; Baohong, Gao

2016-04-01

The replacement metal gate (RMG) defectivity performance control is very challenging in high-k metal gate (HKMG) chemical mechanical polishing (CMP). In this study, three major defect types, including fall-on particles, micro-scratch and corrosion have been investigated. The research studied the effects of polishing pad, pressure, rotating speed, flow rate and post-CMP cleaning on the three kinds of defect, which finally eliminated the defects and achieved good surface morphology. This study will provide an important reference value for the future research of aluminum metal gate CMP. Project supported by the Major National Science and Technology Special Projects (No. 2009ZX02308), the Natural Science Foundation for the Youth of Hebei Province (Nos. F2012202094, F2015202267), and the Outstanding Youth Science and Technology Innovation Fund of Hebei University of Technology (No. 2013010).

Atomic-scale and pit-free flattening of GaN by combination of plasma pretreatment and time-controlled chemical mechanical polishing

DOE Office of Scientific and Technical Information (OSTI.GOV)

Deng, Hui; Endo, Katsuyoshi; Yamamura, Kazuya, E-mail: yamamura@upst.eng.osaka-u.ac.jp

2015-08-03

Chemical mechanical polishing (CMP) combined with atmospheric-pressure plasma pretreatment was applied to a GaN (0001) substrate. The irradiation of a CF{sub 4}-containing plasma was proven to be very useful for modifying the surface of GaN. When CMP was conducted on a plasma-irradiated surface, a modified layer of GaF{sub 3} acted as a protective layer on GaN by preventing the formation of etch pits. Within a short duration (8 min) of CMP using a commercially available CeO{sub 2} slurry, an atomically flat surface with a root mean square (rms) roughness of 0.11 nm was obtained. Moreover, etch pits, which are inevitably introduced inmore » conventional CMP, could not be observed at the dislocation sites on the polished GaN surface. It was revealed that CMP combined with the plasma pretreatment was very effective for obtaining a pit-free and atomically flat GaN surface.« less

Effect of slurry composition on the chemical mechanical polishing of thin diamond films

PubMed Central

Werrell, Jessica M.; Mandal, Soumen; Thomas, Evan L. H.; Brousseau, Emmanuel B.; Lewis, Ryan; Borri, Paola; Davies, Philip R.; Williams, Oliver A.

2017-01-01

Nanocrystalline diamond (NCD) thin films grown by chemical vapour deposition have an intrinsic surface roughness, which hinders the development and performance of the films’ various applications. Traditional methods of diamond polishing are not effective on NCD thin films. Films either shatter due to the combination of wafer bow and high mechanical pressures or produce uneven surfaces, which has led to the adaptation of the chemical mechanical polishing (CMP) technique for NCD films. This process is poorly understood and in need of optimisation. To compare the effect of slurry composition and pH upon polishing rates, a series of NCD thin films have been polished for three hours using a Logitech Ltd. Tribo CMP System in conjunction with a polyester/polyurethane polishing cloth and six different slurries. The reduction in surface roughness was measured hourly using an atomic force microscope. The final surface chemistry was examined using X-ray photoelectron spectroscopy and a scanning electron microscope. It was found that of all the various properties of the slurries, including pH and composition, the particle size was the determining factor for the polishing rate. The smaller particles polishing at a greater rate than the larger ones. PMID:29057022

Effect of slurry composition on the chemical mechanical polishing of thin diamond films

NASA Astrophysics Data System (ADS)

Werrell, Jessica M.; Mandal, Soumen; Thomas, Evan L. H.; Brousseau, Emmanuel B.; Lewis, Ryan; Borri, Paola; Davies, Philip R.; Williams, Oliver A.

2017-12-01

Nanocrystalline diamond (NCD) thin films grown by chemical vapour deposition have an intrinsic surface roughness, which hinders the development and performance of the films' various applications. Traditional methods of diamond polishing are not effective on NCD thin films. Films either shatter due to the combination of wafer bow and high mechanical pressures or produce uneven surfaces, which has led to the adaptation of the chemical mechanical polishing (CMP) technique for NCD films. This process is poorly understood and in need of optimisation. To compare the effect of slurry composition and pH upon polishing rates, a series of NCD thin films have been polished for three hours using a Logitech Ltd. Tribo CMP System in conjunction with a polyester/polyurethane polishing cloth and six different slurries. The reduction in surface roughness was measured hourly using an atomic force microscope. The final surface chemistry was examined using X-ray photoelectron spectroscopy and a scanning electron microscope. It was found that of all the various properties of the slurries, including pH and composition, the particle size was the determining factor for the polishing rate. The smaller particles polishing at a greater rate than the larger ones.

Characterization of chemical interactions during chemical mechanical polishing (CMP) of copper

NASA Astrophysics Data System (ADS)

Lee, Seung-Mahn

2003-10-01

Chemical mechanical polishing (CMP) has received much attention as an unique technique to provide a wafer level planarization in semiconductor manufacturing. However, despite the extensive use of CMP, it still remains one of the least understood areas in semiconductor processing. The lack of the fundamental understanding is a significant barrier to further advancements in CMP technology. One critical aspect of metal CMP is the formation of a thin surface layer on the metal surface. The formation and removal of this layer controls all the aspects of the CMP process, including removal rate, surface finish, etc. In this dissertation, we focus on the characterization of the formation and removal of the thin surface layer on the copper surface. The formation dynamics was investigated using static and dynamic electrochemical techniques, including potentiodynamic scans and chronoamperometry. The results were validated using XPS measurements. The mechanical properties of the surface layer were investigated using nanoindentation measurements. The electrochemical investigation showed that the thickness of the surface layer is controlled by the chemicals such as an oxidizer (hydrogen peroxide), a corrosion inhibitor (benzotriazole), a complexing agent (citric acid), and their concentrations. The dynamic electrochemical measurements indicated that the initial layer formation kinetics is unaffected by the corrosion inhibitors. The passivation due to the corrosion inhibitor becomes important only on large time scales (>200 millisecond). The porosity and the density of the chemically modified surface layer can be affected by additives of other chemicals such as citric acid. An optimum density of the surface layer is required for high polishing rate while at the same time maintaining a high degree of surface finish. Nanoindentation measurements indicated that the mechanical properties of the surface layer are strongly dependent on the chemical additives in the slurry. The CMP removal rates were found to be in good agreement with the initial reaction kinetics as well as the mechanical properties of the chemically modified surface layer. In addition, the material removal model based on the micro- and nano-scale interactions, which were measured experimentally, has been developed.

Effect of photocatalytic oxidation technology on GaN CMP

NASA Astrophysics Data System (ADS)

Wang, Jie; Wang, Tongqing; Pan, Guoshun; Lu, Xinchun

2016-01-01

GaN is so hard and so chemically inert that it is difficult to obtain a high material removal rate (MRR) in the chemical mechanical polishing (CMP) process. This paper discusses the application of photocatalytic oxidation technology in GaN planarization. Three N-type semiconductor particles (TiO2, SnO2, and Fe2O3) are used as catalysts and added to the H2O2-SiO2-based slurry. By optical excitation, highly reactive photoinduced holes are produced on the surface of the particles, which can oxidize OH- and H2O absorbed on the surface of the catalysts; therefore, more OH* will be generated. As a result, GaN MRRs in an H2O2-SiO2-based polishing system combined with catalysts are improved significantly, especially when using TiO2, the MRR of which is 122 nm/h. The X-ray photoelectron spectroscopy (XPS) analysis shows the variation trend of chemical composition on the GaN surface after polishing, revealing the planarization process. Besides, the effect of pH on photocatalytic oxidation combined with TiO2 is analyzed deeply. Furthermore, the physical model of GaN CMP combined with photocatalytic oxidation technology is proposed to describe the removal mechanism of GaN.

Study on effect of the surface variation of colloidal silica abrasive during chemical mechanical polishing of sapphire

NASA Astrophysics Data System (ADS)

Bun-Athuek, Natthaphon; Yoshimoto, Yutaka; Sakai, Koya; Khajornrungruang, Panart; Suzuki, Keisuke

2017-07-01

The surface and diameter size variations of colloidal silica particles during the chemical mechanical polishing (CMP) of sapphire substrates were investigated using different particle diameters of 20 and 55 nm. Dynamic light scattering (DLS) results show that the silica particles became larger after CMP under both conditions. The increase in particle size in the slurry was proportional to the material removal amount (MRA) as a function of the removed volume of sapphire substrates by CMP and affected the material removal rate (MRR). Transmission electron microscopy (TEM) images revealed an increase in the size of the fine particles and a change in their surface shape in the slurry. The colloidal silica was coated with the material removed from the substrate during CMP. In this case, the increase in the size of 55 nm diameter particles is larger than that of 20 nm diameter particles. X-ray fluorescence spectrometry (XRF) results indicate that the aluminum element from polished sapphire substrates adhered to the surfaces of silica particles. Therefore, MRR decreases with increasing of polishing time owing to the degradation of particles in the slurry.

A nano-scale mirror-like surface of Ti-6Al-4V attained by chemical mechanical polishing

NASA Astrophysics Data System (ADS)

Chenliang, Liang; Weili, Liu; Shasha, Li; Hui, Kong; Zefang, Zhang; Zhitang, Song

2016-05-01

Metal Ti and its alloys have been widely utilized in the fields of aviation, medical science, and micro-electro-mechanical systems, for its excellent specific strength, resistance to corrosion, and biological compatibility. As the application of Ti moves to the micro or nano scale, however, traditional methods of planarization have shown their short slabs. Thus, we introduce the method of chemical mechanical polishing (CMP) to provide a new way for the nano-scale planarization method of Ti alloys. We obtain a mirror-like surface, whose flatness is of nano-scale, via the CMP method. We test the basic mechanical behavior of Ti-6Al-4V (Ti64) in the CMP process, and optimize the composition of CMP slurry. Furthermore, the possible reactions that may take place in the CMP process have been studied by electrochemical methods combined with x-ray photoelectron spectroscopy (XPS). An equivalent circuit has been built to interpret the dynamic of oxidation. Finally, a model has been established to explain the synergy of chemical and mechanical effects in the CMP of Ti-6Al-4V. Project supported by the National Major Scientific and Technological Special Project during the Twelfth Five-year Plan Period of China (Grant No. 2009ZX02030-1), the National Natural Science Foundation of China (Grant No. 51205387), the Support by Science and Technology Commission of Shanghai City, China (Grant No. 11nm0500300), and the Science and Technology Commission of Shanghai City, China (Grant No. 14XD1425300).

Monoatomic layer removal mechanism in chemical mechanical polishing process: A molecular dynamics study

NASA Astrophysics Data System (ADS)

Si, Lina; Guo, Dan; Luo, Jianbin; Lu, Xinchun

2010-03-01

Molecular dynamics simulations of nanoscratching processes were used to study the atomic-scale removal mechanism of single crystalline silicon in chemical mechanical polishing (CMP) process and particular attention was paid to the effect of scratching depth. The simulation results under a scratching depth of 1 nm showed that a thick layer of silicon material was removed by chip formation and an amorphous layer was formed on the silicon surface after nanoscratching. By contrast, the simulation results with a depth of 0.1 nm indicated that just one monoatomic layer of workpiece was removed and a well ordered crystalline surface was obtained, which is quite consistent with previous CMP experimental results. Therefore, monoatomic layer removal mechanism was presented, by which it is considered that during CMP process the material was removed by one monoatomic layer after another, and the mechanism could provide a reasonable understanding on how the high precision surface was obtained. Also, the effects of the silica particle size and scratching velocity on the removal mechanism were investigated; the wear regimes and interatomic forces between silica particle and workpiece were studied to account for the different removal mechanisms with indentation depths of 0.1 and 1 nm.

Fundamental studies on silicon dioxide chemical mechanical polishing

NASA Astrophysics Data System (ADS)

Mahajan, Uday

Chemical Mechanical Polishing (CMP) has lately been adopted on a large scale by the semiconductor industry for planarizing and patterning metal and dielectric films. Additionally, CMP has been used for hundreds of years for optical polishing. Still, several aspects of this process remain poorly understood. In this study, some results on CMP of SiO2 are presented with a view to characterizing the effects of abrasive properties and slurry chemistry on the polishing process. Additionally, some results from a novel in-situ friction force measuring instrument are also presented. The friction force results showed the effect of several parameters such as surface roughness, solution pH and ionic strength on wafer-pad interactions. Additionally, monitoring the friction as a function of velocity showed that the transition from boundary lubrication to full fluid-film lubrication depends on the roughness (conditioning) of the polishing pad. The parameters investigated in the polishing experiments include abrasive size and concentration. From the experimental results, it was found that an optimum concentration exists for each abrasive size, which shifts to lower values and becomes narrower as particle size increases. From calculations, this was attributed to a decreased ability of the large particles to chemically modify the surface of the SiO2 films. The smaller particles, having a much larger surface area, are able to better adsorb dissolution and abrasion products at high concentrations, thus leading to high removal rates under those conditions. Studies on the effect of slurry ionic strength showed that the ability of a metal ion to shield the surface charge on the surfaces interacting during polishing is what determined removal rate. This was due to the reduced electrostatic repulsion between the surfaces, which resulted in better contact and thus higher polishing rates. These results were corroborated by the earlier friction force measurements. Finally, the influence of particle density on polishing was shown, with denser alumina particles being able to polish SiO2 much more effectively. Some preliminary results on polishing with different abrasives as a function of slurry pH indicate that the material properties of the abrasives seem to change around their Iso-electric Points (IEP), resulting in almost no polishing, and severe particle contamination on the SiO2 surface.

Adsorption treatment of oxide chemical mechanical polishing wastewater from a semiconductor manufacturing plant by electrocoagulation.

PubMed

Chou, Wei-Lung; Wang, Chih-Ta; Chang, Wen-Chun; Chang, Shih-Yu

2010-08-15

In this study, metal hydroxides generated during electrocoagulation (EC) were used to remove the chemical oxygen demand (COD) of oxide chemical mechanical polishing (oxide-CMP) wastewater from a semiconductor manufacturing plant by EC. Adsorption studies were conducted in a batch system for various current densities and temperatures. The COD concentration in the oxide-CMP wastewater was effectively removed and decreased by more than 90%, resulting in a final wastewater COD concentration that was below the Taiwan discharge standard (100 mg L(-1)). Since the processed wastewater quality exceeded the direct discharge standard, the effluent could be considered for reuse. The adsorption kinetic studies showed that the EC process was best described using the pseudo-second-order kinetic model at the various current densities and temperatures. The experimental data were also tested against different adsorption isotherm models to describe the EC process. The Freundlich adsorption isotherm model predictions matched satisfactorily with the experimental observations. Thermodynamic parameters, including the Gibbs free energy, enthalpy, and entropy, indicated that the COD adsorption of oxide-CMP wastewater on metal hydroxides was feasible, spontaneous and endothermic in the temperature range of 288-318 K. Copyright 2010 Elsevier B.V. All rights reserved.

The stability of a novel weakly alkaline slurry of copper interconnection CMPfor GLSI

NASA Astrophysics Data System (ADS)

Yao, Caihong; Wang, Chenwei; Niu, Xinhuan; Wang, Yan; Tian, Shengjun; Jiang, Zichao; Liu, Yuling

2018-02-01

Chemical mechanical polishing (CMP) is one of the important machining procedures of multilayered copper interconnection for GLSI, meanwhile polishing slurry is a critical factor for realizing the high polishing performance such as high planarization efficiency, low surface roughness. The effect of slurry components such as abrasive (colloidal silica), complexing agent (glycine), inhibitor (BTA) and oxidizing agent (H2O2) on the stability of the novel weakly alkaline slurry of copper interconnection CMP for GLSI was investigated in this paper. First, the synergistic and competitive relationship of them in a peroxide-based weakly alkaline slurry during the copper CMP process was studied and the stability mechanism was put forward. Then 1 wt% colloidal silica, 2.5 wt% glycine, 200 ppm BTA, 20 mL/L H2O2 had been selected as the appropriate concentration to prepare copper slurry, and using such slurry the copper blanket wafer was polished. From the variations of copper removal rate, root-mean square roughness (Sq) value with the setting time, it indicates that the working-life of the novel weakly alkaline slurry can reach more than 7 days, which satisfies the requirement of microelectronics further development. Project supported by the Major National Science and Technology Special Projects (No. 2016ZX02301003-004-007), the Professional Degree Teaching Case Foundation of Hebei Province, China (No. KCJSZ2017008), the Natural Science Foundation of Hebei Province, China (No. F2015202267), and the Natural Science Foundation of Tianjin, China (No. 16JCYBJC16100).

Abrasive rolling effects on material removal and surface finish in chemical mechanical polishing analyzed by molecular dynamics simulation

NASA Astrophysics Data System (ADS)

Si, Lina; Guo, Dan; Luo, Jianbin; Lu, Xinchun; Xie, Guoxin

2011-04-01

In an abrasive chemical mechanical polishing (CMP) process, materials were considered to be removed by abrasive sliding and rolling. Abrasive sliding has been investigated by many molecular dynamics (MD) studies; while abrasive rolling was usually considered to be negligible and therefore was rarely investigated. In this paper, an MD simulation was used to study the effects of abrasive rolling on material removal and surface finish in the CMP process. As the silica particle rolled across the silicon substrate, some atoms of the substrate were dragged out from their original positions and adhered to the silica particle, leaving some atomic vacancies on the substrate surface. Meanwhile, a high quality surface could be obtained. During the abrasive rolling process, the influencing factors of material removal, e.g., external down force and driving force, were also discussed. Finally, MD simulations were carried out to examine the effects of abrasive sliding on material removal under the same external down force as abrasive rolling. The results showed that the ability of abrasive rolling to remove material on the atomic scale was not notably inferior to that of abrasive sliding. Therefore, it can be proposed that both abrasive sliding and rolling play important roles in material removal in the abrasive CMP of the silicon substrate.

Characterization of shallow trench isolation CMP process and its application

NASA Astrophysics Data System (ADS)

Li, Helen; Zhang, ChunLei; Liu, JinBing; Liu, ZhengFang; Chen, Kuang Han; Gbondo-Tugbawa, Tamba; Ding, Hua; Li, Flora; Lee, Brian; Gower-Hall, Aaron; Chiu, Yang-Chih

2016-03-01

Chemical mechanical polishing (CMP) has been a critical enabling technology in shallow trench isolation (STI), which is used in current integrated circuit fabrication process to accomplish device isolation. Excessive dishing and erosion in STI CMP processes, however, create device yield concerns. This paper proposes characterization and modeling techniques to address a variety of concerns in STI CMP. In the past, majority of CMP publications have been addressed on interconnect layers in backend- of-line (BEOL) process. However, the number of CMP steps in front-end-of-line (FEOL) has been increasing in more advanced process techniques like 3D-FinFET and replacement metal gate, as a results incoming topography induced by FEOL CMP steps can no longer be ignored as the topography accumulates and stacks up across multiple CMP steps and eventually propagating to BEOL layers. In this paper, we first discuss how to characterize and model STI CMP process. Once STI CMP model is developed, it can be used for screening design and detect possible manufacturing weak spots. We also work with process engineering team to establish hotspot criteria in terms of oxide dishing and nitride loss. As process technologies move from planar transistor to 3D transistor like FinFet and multi-gate, it is important to accurately predict topography in FEOL CMP processes. These incoming topographies when stacked up can have huge impact in BEOL copper processes, where copper pooling becomes catastrophic yield loss. A calibration methodology to characterize STI CMP step is developed as shown in Figure 1; moreover, this STI CMP model is validated from silicon data collected from product chips not used in calibration stage. Additionally, wafer experimental setup and metrology plan are instrumental to an accurate model with high predictive power. After a model is generated, spec limits and threshold to establish hotspots criteria can be defined. Such definition requires working closely with foundry process engineering and integration team and reviewing past failure analysis (FA) to come up a reasonable metrics. Conventionally, a potential STI weak point can be found when nitride residues remains in the active region after nitride strip. Another source of STI hotspots occurs when nitride erosion is too much, and active region can suffer severe damage.

Electrochemical characterization of bulk and thin film copper in ammonia- and nitric acid-based slurries for chemical mechanical planarization of interconnects

NASA Astrophysics Data System (ADS)

Sainio, Carlyn Anne

Copper will be replacing aluminum as the interconnect material in silicon integrated circuits. Chemical mechanical planarization (CMP) in combination with an inlaid metal interconnection scheme has been utilized to pattern copper interconnects. The thesis describes an attempt to understand the electrochemistry of copper in slurries used for CMP. Steady-state electrochemical potential measurements, linear polarization resistance determinations, and potentiodynamic and potentiostatic polarization scans have been used in order to characterize the mechanism by which copper is removed during CMP. Electrochemical measurements were implemented on a rotating disk assembly to simulate conditions during CMP. Experiments were performed on both bulk copper samples and blanket copper thin films sputter deposited onto silicon wafers. Electrochemical potential measurements have been used in conjunction with potential-pH diagrams to determine the possible copper species which are stable during CMP. Electrochemical results were correlated to CMP experiments to determine slurry compositions with optimum potential-pH ranges for copper planarization. The results indicate that such studies present an opportunity to isolate the electrochemical and chemical effects from the mechanical effects in the CMP of metals and to determine the dependencies of each of these effects on the other. CMP of copper was controlled by the removal of native or non-native surface films. High CMP rates were achieved by matching the rates of film formation and copper and film dissolution. During CMP, surface films are abraded, allowing increased dissolution of copper until the surface film reforms. When the surface was indented by abrasive particles, the corrosion rate of the exposed copper increased by two orders of magnitude. Etchants (i.e. ammonia or nitric acid) were necessary for high CMP rates (120-240 nm/min) and to minimize scratching. CMP rates of copper in 1 volume percent NHsb4OH and 0.7 volume percent HNOsb3 with 0.0016 weight percent KMnOsb4 were comparable. Electrochemical characterization can narrow the possible slurry compositions that may be used for polishing. Also, the possibility of implementing electrochemical techniques to detect the endpoint of polishing was investigated. Although electrochemical measurements in ammonia-based slurries did not indicate when tantalum was exposed, similar measurements may be used to determine when polishing pads should be replaced.

Tribochemical investigation of microelectronic materials

NASA Astrophysics Data System (ADS)

Kulkarni, Milind Sudhakar

To achieve efficient planarization with reduced device dimensions in integrated circuits, a better understanding of the physics, chemistry, and the complex interplay involved in chemical mechanical planarization (CMP) is needed. The CMP process takes place at the interface of the pad and wafer in the presence of the fluid slurry medium. The hardness of Cu is significantly less than the slurry abrasive particles which are usually alumina or silica. It has been accepted that a surface layer can protect the Cu surface from scratching during CMP. Four competing mechanisms in materials removal have been reported: the chemical dissolution of Cu, the mechanical removal through slurry abrasives, the formation of thin layer of Cu oxide and the sweeping surface material by slurry flow. Despite the previous investigation of Cu removal, the electrochemical properties of Cu surface layer is yet to be understood. The motivation of this research was to understand the fundamental aspects of removal mechanisms in terms of electrochemical interactions, chemical dissolution, mechanical wear, and factors affecting planarization. Since one of the major requirements in CMP is to have a high surface finish, i.e., low surface roughness, optimization of the surface finish in reference to various parameters was emphasized. Three approaches were used in this research: in situ measurement of material removal, exploration of the electropotential activation and passivation at the copper surface and modeling of the synergistic electrochemical-mechanical interactions on the copper surface. In this research, copper polishing experiments were conducted using a table top tribometer. A potentiostat was coupled with this tribometer. This combination enabled the evaluation of important variables such as applied pressure, polishing speed, slurry chemistry, pH, materials, and applied DC potential. Experiments were designed to understand the combined and individual effect of electrochemical interactions as well as mechanical impact during polishing. Extensive surface characterization was performed with AFM, SEM, TEM and XPS. An innovative method for direct material removal measurement on the nanometer scale was developed and used. Experimental observations were compared with the theoretically calculated material removal rate values. The synergistic effect of all of the components of the process, which result in a better quality surface finish was quantitatively evaluated for the first time. Impressed potential during CMP proved to be a controlling parameter in the material removal mechanism. Using the experimental results, a model was developed, which provided a practical insight into the CMP process. The research is expected to help with electrochemical material removal in copper planarization with low-k dielectrics.

Development of Formulations for a-SiC and Manganese CMP and Post-CMP Cleaning of Cobalt

NASA Astrophysics Data System (ADS)

Lagudu, Uma Rames Krishna

We have investigated the chemical mechanical polishing (CMP) of amorphous SiC (a-SiC) and Mn and Post CMP cleaning of cobalt for various device applications. During the manufacture of copper interconnects using the damascene process the polishing of copper is followed by the polishing of the barrier material (Co, Mn, Ru and their alloys) and its post CMP cleaning. This is followed by the a-SiC hard mask CMP. Silicon carbide thin films, though of widespread use in microelectronic engineering, are difficult to process by CMP because of their hardness and chemical inertness. The earlier part of the SiC work discusses the development of slurries based on silica abrasives that resulted in high a-SiC removal rates (RRs). The ionic strength of the silica dispersion was found to play a significant role in enhancing material removal rate, while also providing very good post-polish surface-smoothness. For example, the addition of 50 mM potassium nitrate to a pH 8 aqueous slurry consisting of 10 wt % of silica abrasives and 1.47 M hydrogen peroxide increased the RR from about 150 nm/h to about 2100 nm/h. The role of ionic strength in obtaining such high RRs was investigated using surface zeta-potentials measurements and X-ray photoelectron spectroscopy (XPS). Evidently, hydrogen peroxide promoted the oxidation of Si and C to form weakly adhered species that were subsequently removed by the abrasive action of the silica particles. The effect of potassium nitrate in increasing material removal is attributed to the reduction in the electrostatic repulsion between the abrasive particles and the SiC surface because of screening of surface charges by the added electrolyte. We also show that transition metal compounds when used as additives to silica dispersions enhance a-SiC removal rates (RRs). Silica slurries containing potassium permanganate gave RRs as high as 2000 nm/h at pH 4. Addition of copper sulfate to this slurry further enhanced the RRs to ˜3500 nm/h at pH 6. Furthermore, addition of a low concentration of 250 ppm Brij-35 to this slurry suppressed the RRs of silicon dioxide to zero, while retaining the RRs of a-SiC at ˜2700 nm/h , a combination of RRs that is appropriate for hard mask polishing. The second part of this thesis focuses on the polishing of manganese which was proposed as a "self-forming" barrier material to prevent copper diffusion in advanced generation (22 nm and smaller) Si devices. A major challenge associated with such a self-forming Mn barrier for Cu interconnects in sub-22nm devices is galvanic corrosion that can occur at the Cu-Mn interface during chemical mechanical planarization. In the present work, it was shown that an aqueous solution of sucrose, BTA and potassium periodate reduces the corrosion potential gap between Cu and Mn to ˜ 0.01 V at pH 10 while also lowering the galvanic currents significantly and hence can be an excellent candidate for a polishing slurry. We discuss the role of these reagents and the inhibiting film that can be formed at the interface of the bimetallic system in this solution. Preliminary polishing results for Cu and Mn using a silica-based slurry formulated with this solution are also presented. The third part involves the development of compositions for Post CMP cleaning of cobalt barriers in advanced generation (22 nm and smaller). The thickness of the cobalt films was found to impact the corrosion behavior of the films. Thinner films of cobalt were found be more prone to galvanic corrosion in the presence of copper. The corrosion currents were low for both Cu and Co in all the solutions tested but the galvanic currents varied significantly. It was found that while BTA was not able to suppress the galvanic corrosion between Cu and Co (2000 A) at pH 8, either 60 mM of 3 Amino 1,2,4 triazole or 30 mM of 3 Amino 5 methyl thio 1,2,4 triazole were able to suppress the galvanic corrosion between Cu and Co (2000 A) to < 0.3 micro amperes per square cm at pH 8. These compositions however were not able to suppress the galvanic corrosion of Co (20 A) films. Changing the pH to 10 did not improve the results. Furthermore, addition of several complexing agents and other corrosion inhibitors also did not lower the Ecorr of Co (20 A) and Cu. Further experiments are being conducted to identify compositions to protect Co and Cu from corrosion. (Abstract shortened by UMI.).

Surface topography analysis and performance on post-CMP images (Conference Presentation)

NASA Astrophysics Data System (ADS)

Lee, Jusang; Bello, Abner F.; Kakita, Shinichiro; Pieniazek, Nicholas; Johnson, Timothy A.

2017-03-01

Surface topography on post-CMP processing can be measured with white light interference microscopy to determine the planarity. Results are used to avoid under or over polishing and to decrease dishing. The numerical output of the surface topography is the RMS (root-mean-square) of the height. Beyond RMS, the topography image is visually examined and not further quantified. Subjective comparisons of the height maps are used to determine optimum CMP process conditions. While visual comparison of height maps can determine excursions, it's only through manual inspection of the images. In this work we describe methods of quantifying post-CMP surface topography characteristics that are used in other technical fields such as geography and facial-recognition. The topography image is divided into small surface patches of 7x7 pixels. Each surface patch is fitted to an analytic surface equation, in this case a third order polynomial, from which the gradient, directional derivatives, and other characteristics are calculated. Based on the characteristics, the surface patch is labeled as peak, ridge, flat, saddle, ravine, pit or hillside. The number of each label and thus the associated histogram is then used as a quantified characteristic of the surface topography, and could be used as a parameter for SPC (statistical process control) charting. In addition, the gradient for each surface patch is calculated, so the average, maximum, and other characteristics of the gradient distribution can be used for SPC. Repeatability measurements indicate high confidence where individual labels can be lower than 2% relative standard deviation. When the histogram is considered, an associated chi-squared value can be defined from which to compare other measurements. The chi-squared value of the histogram is a very sensitive and quantifiable parameter to determine the within wafer and wafer-to-wafer topography non-uniformity. As for the gradient histogram distribution, the chi-squared could again be calculated and used as yet another quantifiable parameter for SPC. In this work we measured the post Cu CMP of a die designed for 14nm technology. A region of interest (ROI) known to be indicative of the CMP processing is chosen for the topography analysis. The ROI, of size 1800 x 2500 pixels where each pixel represents 2um, was repeatably measured. We show the sensitivity based on measurements and the comparison between center and edge die measurements. The topography measurements and surface patch analysis were applied to hundreds of images representing the periodic process qualification runs required to control and verify CMP performance and tool matching. The analysis is shown to be sensitive to process conditions that vary in polishing time, type of slurry, CMP tool manufacturer, and CMP pad lifetime. Keywords: Keywords: CMP, Topography, Image Processing, Metrology, Interference microscopy, surface processing [1] De Lega, Xavier Colonna, and Peter De Groot. "Optical topography measurement of patterned wafers." Characterization and Metrology for ULSI Technology 2005 788 (2005): 432-436. [2] de Groot, Peter. "Coherence scanning interferometry." Optical Measurement of Surface Topography. Springer Berlin Heidelberg, 2011. 187-208. [3] Watson, Layne T., Thomas J. Laffey, and Robert M. Haralick. "Topographic classification of digital image intensity surfaces using generalized splines and the discrete cosine transformation." Computer Vision, Graphics, and Image Processing 29.2 (1985): 143-167. [4] Wang, Jun, et al. "3D facial expression recognition based on primitive surface feature distribution." Computer Vision and Pattern Recognition, 2006 IEEE Computer Society Conference on. Vol. 2. IEEE, 2006.

Effects of catalyst concentration and ultraviolet intensity on chemical mechanical polishing of GaN

NASA Astrophysics Data System (ADS)

Wang, Jie; Wang, Tongqing; Pan, Guoshun; Lu, Xinchun

2016-08-01

Effects of catalyst concentration and ultraviolet intensity on chemical mechanical polishing (CMP) of GaN were deeply investigated in this paper. Working as an ideal homogeneous substrate material in LED industry, GaN ought to be equipped with a smooth and flat surface. Taking the strong chemical stability of GaN into account, photocatalytic oxidation technology was adopted in GaN CMP process to realize efficient removal. It was found that, because of the improved reaction rate of photocatalytic oxidation, GaN material removal rate (MRR) increases by a certain extent with catalyst concentration increasing. Cross single line analysis on the surface after polishing by Phase Shift MicroXAM-3D was carried out to prove the better removal effect with higher catalyst concentration. Ultraviolet intensity field in H2O2-SiO2-based polishing system was established and simulated, revealing the variation trend of ultraviolet intensity around the outlet of the slurry. It could be concluded that, owing to the higher planarization efficiency and lower energy damage, the UV lamp of 125 W is the most appropriate lamp in this system. Based on the analysis, defects removal model of this work was proposed to describe the effects of higher catalyst concentration and higher power of UV lamp.

Key Processes of Silicon-On-Glass MEMS Fabrication Technology for Gyroscope Application.

PubMed

Ma, Zhibo; Wang, Yinan; Shen, Qiang; Zhang, Han; Guo, Xuetao

2018-04-17

MEMS fabrication that is based on the silicon-on-glass (SOG) process requires many steps, including patterning, anodic bonding, deep reactive ion etching (DRIE), and chemical mechanical polishing (CMP). The effects of the process parameters of CMP and DRIE are investigated in this study. The process parameters of CMP, such as abrasive size, load pressure, and pH value of SF1 solution are examined to optimize the total thickness variation in the structure and the surface quality. The ratio of etching and passivation cycle time and the process pressure are also adjusted to achieve satisfactory performance during DRIE. The process is optimized to avoid neither the notching nor lag effects on the fabricated silicon structures. For demonstrating the capability of the modified CMP and DRIE processes, a z-axis micro gyroscope is fabricated that is based on the SOG process. Initial test results show that the average surface roughness of silicon is below 1.13 nm and the thickness of the silicon is measured to be 50 μm. All of the structures are well defined without the footing effect by the use of the modified DRIE process. The initial performance test results of the resonant frequency for the drive and sense modes are 4.048 and 4.076 kHz, respectively. The demands for this kind of SOG MEMS device can be fulfilled using the optimized process.

SEMICONDUCTOR TECHNOLOGY Dummy fill effect on CMP planarity

NASA Astrophysics Data System (ADS)

Junxiong, Zhou; Lan, Chen; Wenbiao, Ruan; Zhigang, Li; Weixiang, Shen; Tianchun, Ye

2010-10-01

With the use of a chemical-mechanical polishing (CMP) simulator verified by testing data from a foundry, the effect of dummy fill characteristics, such as fill size, fill density and fill shape, on CMP planarity is analyzed. The results indicate that dummy density has a significant impact on oxide erosion, and copper dishing is in proportion to dummy size. We also demonstrate that cross shape dummy fill can have the best dishing performance at the same density.

KDP Aqueous Solution-in-Oil Microemulsion for Ultra-Precision Chemical-Mechanical Polishing of KDP Crystal

PubMed Central

Dong, Hui; Wang, Lili; Gao, Wei; Li, Xiaoyuan; Wang, Chao; Ji, Fang; Pan, Jinlong; Wang, Baorui

2017-01-01

A novel functional KH2PO4 (KDP) aqueous solution-in-oil (KDP aq/O) microemulsion system for KDP crystal ultra-precision chemical-mechanical polishing (CMP) was prepared. The system, which consisted of decanol, Triton X-100, and KH2PO4 aqueous solution, was available at room temperature. The functional KDP aq/O microemulsion system was systematically studied and applied as polishing solution to KDP CMP technology. In this study, a controlled deliquescent mechanism was proposed for KDP polishing with the KDP aq/O microemulsion. KDP aqueous solution, the chemical etchant in the polishing process, was caged into the micelles in the microemulsion, leading to a limitation of the reaction between the KDP crystal and KDP aqueous solution only if the microemulsion was deformed under the effect of the external force. Based on the interface reaction dynamics, KDP aqueous solutions with different concentrations (cKDP) were applied to replace water in the traditional water-in-oil (W/O) microemulsion. The practicability of the controlled deliquescent mechanism was proved by the decreasing material removal rate (MRR) with the increasing of the cKDP. As a result, the corrosion pits on the KDP surface were avoided to some degree. Moreover, the roughnesses of KDP with KDP aq/O microemulsion (cKDP was changed from 10 mM to 100 mM) as polishing solutions were smaller than that with the W/O microemulsion. The smallest surface root-mean-square roughness of 1.5 nm was obtained at a 30 mmol/L KDP aq solution, because of the most appropriate deliquescent rate and MRR. PMID:28772632

KDP Aqueous Solution-in-Oil Microemulsion for Ultra-Precision Chemical-Mechanical Polishing of KDP Crystal.

PubMed

Dong, Hui; Wang, Lili; Gao, Wei; Li, Xiaoyuan; Wang, Chao; Ji, Fang; Pan, Jinlong; Wang, Baorui

2017-03-09

A novel functional KH₂PO₄ (KDP) aqueous solution-in-oil (KDP aq/O) microemulsion system for KDP crystal ultra-precision chemical-mechanical polishing (CMP) was prepared. The system, which consisted of decanol, Triton X-100, and KH₂PO₄ aqueous solution, was available at room temperature. The functional KDP aq/O microemulsion system was systematically studied and applied as polishing solution to KDP CMP technology. In this study, a controlled deliquescent mechanism was proposed for KDP polishing with the KDP aq/O microemulsion. KDP aqueous solution, the chemical etchant in the polishing process, was caged into the micelles in the microemulsion, leading to a limitation of the reaction between the KDP crystal and KDP aqueous solution only if the microemulsion was deformed under the effect of the external force. Based on the interface reaction dynamics, KDP aqueous solutions with different concentrations ( c KDP ) were applied to replace water in the traditional water-in-oil (W/O) microemulsion. The practicability of the controlled deliquescent mechanism was proved by the decreasing material removal rate (MRR) with the increasing of the c KDP . As a result, the corrosion pits on the KDP surface were avoided to some degree. Moreover, the roughnesses of KDP with KDP aq/O microemulsion ( c KDP was changed from 10 mM to 100 mM) as polishing solutions were smaller than that with the W/O microemulsion. The smallest surface root-mean-square roughness of 1.5 nm was obtained at a 30 mmol/L KDP aq solution, because of the most appropriate deliquescent rate and MRR.

A novel kind of TSV slurry with guanidine hydrochloride

NASA Astrophysics Data System (ADS)

Jiao, Hong; Yuling, Liu; Baoguo, Zhang; Xinhuan, Niu; Liying, Han

2015-10-01

The effect of a novel alkaline TSV (through-silicon-via) slurry with guanidine hydrochloride (GH) on CMP (chemical mechanical polishing) was investigated. The novel alkaline TSV slurry was free of any inhibitors. During the polishing process, the guanidine hydrochloride serves as an effective surface-complexing agent for TSV CMP applications, the removal rate of barrier (Ti) can be chemically controlled through tuned selectivity with respect to the removal rate of copper and dielectric, which is helpful to modifying the dishing and gaining an excellent topography performance in TSV manufacturing. In this paper, we mainly studied the working mechanism of the components of slurry and the skillful application guanidine hydrochloride in the TSV slurry. Project supported by the Major National Science and Technology Special Projects (No. 2009ZX02308), the Fund Project of Hebei Provincial Department of Education, China (No. QN2014208), the Natural Science Foundation of Hebei Province, China (No. E2013202247), and Colleges and Universities Scientific research project of Hebei Province, China (No. Z2014088).

X-ray characterization techniques for the assessment of surface damage in crystalline wafers: A model study in AlN

NASA Astrophysics Data System (ADS)

Bobea, M.; Tweedie, J.; Bryan, I.; Bryan, Z.; Rice, A.; Dalmau, R.; Xie, J.; Collazo, R.; Sitar, Z.

2013-03-01

A high-resolution X-ray diffraction method with enhanced surface sensitivity has been used to investigate the effects of various polishing steps on the near-surface region of single crystal substrates. The method involves the study of a highly asymmetric reflection, observable under grazing incidence conditions. Analysis of rocking curve measurements and reciprocal space maps (RSMs) revealed subtle structural differences between the polished substrates. For aluminum nitride wafers, damage induced from diamond sawing and mechanical polishing was readily identifiable by on-axis rocking curves, but this method was unable to distinguish between sample surfaces subjected to various degrees of chemical mechanical polishing (CMP). To characterize sufficiently these surfaces, (10.3) RSMs were measured to provide both qualitative and quantitative information about the near-surface region. Two features present in the RSMs were utilized to quantitatively assess the polished wafers: the magnitude of the diffuse scatter in the omega-scans and the elongation of the crystal truncation rod. The method is able to distinguish between different degrees of CMP surface preparation and provides metrics to quantify subsurface damage after this polishing step.

Chemical-mechanical polishing of recessed microelectromechanical devices

DOEpatents

Barron, Carole C.; Hetherington, Dale L.; Montague, Stephen

1999-01-01

A method is disclosed for micromachining recessed layers (e.g. sacrificial layers) of a microelectromechanical system (MEMS) device formed in a cavity etched into a semiconductor substrate. The method uses chemical-mechanical polishing (CMP) with a resilient polishing pad to locally planarize one or more of the recessed layers within the substrate cavity. Such local planarization using the method of the present invention is advantageous for improving the patterning of subsequently deposited layers, for eliminating mechanical interferences between functional elements (e.g. linkages) of the MEMS device, and for eliminating the formation of stringers. After the local planarization of one or more of the recessed layers, another CMP step can be provided for globally planarizing the semiconductor substrate to form a recessed MEMS device which can be integrated with electronic circuitry (e.g. CMOS, BiCMOS or bipolar circuitry) formed on the surface of the substrate.

Chemical-mechanical polishing of recessed microelectromechanical devices

DOEpatents

Barron, C.C.; Hetherington, D.L.; Montague, S.

1999-07-06

A method is disclosed for micromachining recessed layers (e.g. sacrificial layers) of a microelectromechanical system (MEMS) device formed in a cavity etched into a semiconductor substrate. The method uses chemical-mechanical polishing (CMP) with a resilient polishing pad to locally planarize one or more of the recessed layers within the substrate cavity. Such local planarization using the method of the present invention is advantageous for improving the patterning of subsequently deposited layers, for eliminating mechanical interferences between functional elements (e.g. linkages) of the MEMS device, and for eliminating the formation of stringers. After the local planarization of one or more of the recessed layers, another CMP step can be provided for globally planarizing the semiconductor substrate to form a recessed MEMS device which can be integrated with electronic circuitry (e.g., CMOS, BiCMOS or bipolar circuitry) formed on the surface of the substrate. 23 figs.

In situ measurement method for film thickness using transparency resin sheet with low refractive index under wet condition on chemical mechanical polishing

NASA Astrophysics Data System (ADS)

Oniki, Takahiro; Khajornrungruang, Panart; Suzuki, Keisuke

2017-07-01

We suggest that a transparency resin sheet with low refractive index can be applied to the measurement of a silicon dioxide (SiO2) film on a silicon wafer under wet condition for a film thickness measurement system on chemical mechanical polishing (CMP). By adjusting the refractive indices of the resin sheet and water, stable measurements of the SiO2 film can be expected, irrespective of slurry film thickness fluctuation because it has robustness against the slurry film. This result indicates that the transparency resin sheet with low refractive index is a useful for monitoring system of CMP.

Influence of Si wafer thinning processes on (sub)surface defects

NASA Astrophysics Data System (ADS)

Inoue, Fumihiro; Jourdain, Anne; Peng, Lan; Phommahaxay, Alain; De Vos, Joeri; Rebibis, Kenneth June; Miller, Andy; Sleeckx, Erik; Beyne, Eric; Uedono, Akira

2017-05-01

Wafer-to-wafer three-dimensional (3D) integration with minimal Si thickness can produce interacting multiple devices with significantly scaled vertical interconnections. Realizing such a thin 3D structure, however, depends critically on the surface and subsurface of the remaining backside Si after the thinning processes. The Si (sub)surface after mechanical grinding has already been characterized fruitfully for a range of few dozen of μm. Here, we expand the characterization of Si (sub)surface to 5 μm thickness after thinning process on dielectric bonded wafers. The subsurface defects and damage layer were investigated after grinding, chemical mechanical polishing (CMP), wet etching and plasma dry etching. The (sub)surface defects were characterized using transmission microscopy, atomic force microscopy, and positron annihilation spectroscopy. Although grinding provides the fastest removal rate of Si, the surface roughness was not compatible with subsequent processing. Furthermore, mechanical damage such as dislocations and amorphous Si cannot be reduced regardless of Si thickness and thin wafer handling systems. The CMP after grinding showed excellent performance to remove this grinding damage, even though the removal amount is 1 μm. For the case of Si thinning towards 5 μm using grinding and CMP, the (sub)surface is atomic scale of roughness without vacancy. For the case of grinding + dry etch, vacancy defects were detected in subsurface around 0.5-2 μm. The finished surface after wet etch remains in the nm scale in the strain region. By inserting a CMP step in between grinding and dry etch it is possible to significantly reduce not only the roughness, but also the remaining vacancies at the subsurface. The surface of grinding + CMP + dry etching gives an equivalent mono vacancy result as to that of grinding + CMP. This combination of thinning processes allows development of extremely thin 3D integration devices with minimal roughness and vacancy surface.

Abrasive Particle Trajectories and Material Removal Non-Uniformity during CMP and Filtration Characteristics of CMP Slurries - A Simulation and Experimental Study

NASA Astrophysics Data System (ADS)

Rastegar, Vahid

Nanoscale finishing and planarization are integral process steps in multilevel metallization designs for integrated circuit (IC) manufacturing since it is necessary to ensure local and global surface planarization at each metal layer before depositing the next layer. Chemical mechanical planarization (CMP) has been widely recognized as the most promising technology to eliminate topographic variation and has allowed the construction of multilevel interconnection structures with a more regularly stacked sequence, resulting in better device performance [1]. Understanding fundamental of the CMP mechanisms can offer guidance to the control and optimization of the polishing processes. CMP kinematics based on slurry distribution and particle trajectories have a significant impact on MRR profiles. In this work a mathematical model to describe particle trajectories during chemical mechanical polishing was developed and extended to account for the effect of larger particles, particle location changes due to slurry dispensing and in-situ conditioning. Material removal rate (MRR) and within wafer non-uniformity (WIWNU) were determined based on the calculated particle trajectory densities. Rotary dynamics and reciprocating motion were optimized to obtain best MRR uniformity. Edge-fast MRR profile was discussed based on mechanical aspect of CMP. Using the model, we also investigated the effect of variable rotational speeds of wafer and pad, and of large particles on WIWNU and scratch growth. It was shown that the presence of even a small portion of large particles can deteriorate the WIWNU significantly and also lead to more scratches. Furthermore, it was shown that the in-situ conditioning improves the uniformity of the polished wafers. Furthermore, a combined experimental and computational study of fibrous filters for removal of larger abrasive particles from aqueous dispersions, essential to minimize defects during chemical mechanical polishing, was performed. Dilute aqueous suspensions of colloidal ceria particles, of known size distribution, were filtered at different flow rates and the filter efficiencies were measured for different particle sizes and pH, then converted to single fiber efficiencies. The particle size distributions were also measured for the influent and effluent streams. In a series of numerical simulations, the Navier-Stokes equation was solved for a single fiber using the ANSYS-FLUENT computational fluid dynamics commercial package. For dilute suspensions, the motion of the dispersed particles in the size range of 35-600 nm and zeta potential range of -50 to 50 mV was tracked in the Lagrangian reference frame including the effects of hydrodynamic drag, lift, gravity, hydrodynamic retardation, Brownian, van der Waals and electric double layer forces. The electric double layer and van der Waals forces were incorporated in the calculations by developing a user defined function. Particular attention was given to the effects of Brownian excitations, as well as the electric double layer and van der Waals forces that have been neglected in many of the previous models on the overall fiber collection efficiency for different particle sizes and charges. Moreover, the effect of flow velocity on the fiber capture efficiency and residence time was investigated. The effect of velocity on minimum collection efficiency and most penetrating particle size was investigated. It was also shown that the CFD results are in a good agreement with the experimental results.

Performance of colloidal silica and ceria based slurries on CMP of Si-face 6H-SiC substrates

NASA Astrophysics Data System (ADS)

Chen, Guomei; Ni, Zifeng; Xu, Laijun; Li, Qingzhong; Zhao, Yongwu

2015-12-01

Colloidal silica and ceria based slurries, both using KMnO4 as an oxidizer, for chemical mechanical polishing (CMP) of Si-face (0 0 0 1) 6H-SiC substrate, were investigated to obtain higher material removal rate (MRR) and ultra-smooth surface. The results indicate that there was a significant difference in the CMP performance of 6H-SiC between silica and ceria based slurries. For the ceria based slurries, a higher MRR was obtained, especially in strong acid KMnO4 environment, and the maximum MRR (1089 nm/h) and a smoother surface with an average roughness Ra of 0.11 nm was achieved using slurries containing 2 wt% colloidal ceria, 0.05 M KMnO4 at pH 2. In contrast, due to the attraction between negative charged silica particles and positive charged SiC surface below pH 5, the maximum MRR of silica based slurry was only 185 nm/h with surface roughness Ra of 0.254 nm using slurries containing 6 wt% colloidal silica, 0.05 M KMnO4 at pH 6. The polishing mechanism was discussed based on the zeta potential measurements of the abrasives and the X-ray photoelectron spectroscopy (XPS) analysis of the polished SiC surfaces.

Sensor-based monitoring and inspection of surface morphology in ultraprecision manufacturing processes

NASA Astrophysics Data System (ADS)

Rao, Prahalad Krishna

This research proposes approaches for monitoring and inspection of surface morphology with respect to two ultraprecision/nanomanufacturing processes, namely, ultraprecision machining (UPM) and chemical mechanical planarization (CMP). The methods illustrated in this dissertation are motivated from the compelling need for in situ process monitoring in nanomanufacturing and invoke concepts from diverse scientific backgrounds, such as artificial neural networks, Bayesian learning, and algebraic graph theory. From an engineering perspective, this work has the following contributions: 1. A combined neural network and Bayesian learning approach for early detection of UPM process anomalies by integrating data from multiple heterogeneous in situ sensors (force, vibration, and acoustic emission) is developed. The approach captures process drifts in UPM of aluminum 6061 discs within 15 milliseconds of their inception and is therefore valuable for minimizing yield losses. 2. CMP process dynamics are mathematically represented using a deterministic multi-scale hierarchical nonlinear differential equation model. This process-machine inter-action (PMI) model is evocative of the various physio-mechanical aspects in CMP and closely emulates experimentally acquired vibration signal patterns, including complex nonlinear dynamics manifest in the process. By combining the PMI model predictions with features gathered from wirelessly acquired CMP vibration signal patterns, CMP process anomalies, such as pad wear, and drifts in polishing were identified in their nascent stage with high fidelity (R2 ~ 75%). 3. An algebraic graph theoretic approach for quantifying nano-surface morphology from optical micrograph images is developed. The approach enables a parsimonious representation of the topological relationships between heterogeneous nano-surface fea-tures, which are enshrined in graph theoretic entities, namely, the similarity, degree, and Laplacian matrices. Topological invariant measures (e.g., Fiedler number, Kirchoff index) extracted from these matrices are shown to be sensitive to evolving nano-surface morphology. For instance, we observed that prominent nanoscale morphological changes on CMP processed Cu wafers, although discernible visually, could not be tractably quantified using statistical metrology parameters, such as arithmetic average roughness (Sa), root mean square roughness (Sq), etc. In contrast, CMP induced nanoscale surface variations were captured on invoking graph theoretic topological invariants. Consequently, the graph theoretic approach can enable timely, non-contact, and in situ metrology of semiconductor wafers by obviating the need for reticent profile mapping techniques (e.g., AFM, SEM, etc.), and thereby prevent the propagation of yield losses over long production runs.

SEMICONDUCTOR TECHNOLOGY Effects of the reciprocating parameters of the carrier on material removal rate and non-uniformity in CMP

NASA Astrophysics Data System (ADS)

Cailing, Wang; Renke, Kang; Zhuji, Jin; Dongming, Guo

2010-12-01

Based on the Preston equation, the mathematical model of the material removal rate (MRR), aiming at a line-orbit chemical mechanical polisher, is established. The MRR and the material removal non-uniformity (MRNU) are numerically calculated by MATLAB, and the effects of the reciprocating parameters on the MRR and the MRNU are discussed. It is shown that the smaller the inclination angle and the larger the amplitude, the higher the MRR and the lower the MRNU. The reciprocating speed of the carrier plays a minor role to improve the MRR and decrease the MRNU. The results provide a guide for the design of a polisher and the determination of a process in line-orbit chemical mechanical polishing.

Automated AFM for small-scale and large-scale surface profiling in CMP applications

NASA Astrophysics Data System (ADS)

Zandiatashbar, Ardavan; Kim, Byong; Yoo, Young-kook; Lee, Keibock; Jo, Ahjin; Lee, Ju Suk; Cho, Sang-Joon; Park, Sang-il

2018-03-01

As the feature size is shrinking in the foundries, the need for inline high resolution surface profiling with versatile capabilities is increasing. One of the important areas of this need is chemical mechanical planarization (CMP) process. We introduce a new generation of atomic force profiler (AFP) using decoupled scanners design. The system is capable of providing small-scale profiling using XY scanner and large-scale profiling using sliding stage. Decoupled scanners design enables enhanced vision which helps minimizing the positioning error for locations of interest in case of highly polished dies. Non-Contact mode imaging is another feature of interest in this system which is used for surface roughness measurement, automatic defect review, and deep trench measurement. Examples of the measurements performed using the atomic force profiler are demonstrated.

Colloidal and electrochemical aspects of copper-CMP

NASA Astrophysics Data System (ADS)

Sun, Yuxia

Copper based interconnects with low dielectric constant layers are currently used to increase interconnect densities and reduce interconnect time delays in integrated circuits. The technology used to develop copper interconnects involves Chemical Mechanical Planarization (CMP) of copper films deposited on low-k layers (silica or silica based films), which is carried out using slurries containing abrasive particles. One issue using such a structure is copper contamination over dielectric layers (SiO2 film), if not reduced, this contamination will cause current leakage. In this study, the conditions conducive to copper contamination onto SiO2 films during Cu-CMP process were studied, and a post-CMP cleaning technique was discussed based on experimental results. It was found that the adsorption of copper onto a silica surface is kinetically fast (<0.5 minute). The amount of copper absorbed is pH and concentration dependent and affected by presence of H2O2, complexing agents, and copper corrosion inhibitor Benzotrazole. Based on de-sorption results, DI water alone was unable to reduce adsorbed copper to an acceptable level, especially for adsorption that takes place at a higher pH condition. The addition of complex agent, citric acid, proved effective in suppressing copper adsorption onto oxide silica during polishing or post-CMP cleaning by forming stable copper-CA complexes. Surface Complexation Modeling was used to simulate copper adsorption isotherms and predict the copper contamination levels on SiO2 surfaces. Another issue with the application of copper CMP is its environmental impact. CMP is a costly process due to its huge consumption of pure water and slurry. Additionally, Cu-CMP processing generates a waste stream containing certain amounts of copper and abrasive slurry particles. In this study, the separation technique electrocoagulation was investigated to remove both copper and abrasive slurry particles simultaneously. For effluent containing ˜40 ppm dissolved copper, it was found that ˜90% dissolved copper was removed from the waste streams through electroplating and in-situ chemical precipitation. The amount of copper removed through plating is impacted by membrane surface charge, type/amount of complexing agents, and solid content in the slurry suspension. The slurry particles can be removed ˜90% within 2 hours of EC through multiple mechanisms.

Mechanism of the development of a weakly alkaline barrier slurry without BTA and oxidizer

NASA Astrophysics Data System (ADS)

Xiaodong, Luan; Yuling, Liu; Xinhuan, Niu; Juan, Wang

2015-07-01

Controllable removal rate selectivity with various films (Cu, Ta, SiO2) is a challenging job in barrier CMP. H2O2 as an oxidizer and benzotriazole (BTA) as an inhibitor is considered to be an effective method in barrier CMP. Slurries that contain hydrogen peroxide have a very short shelf life because H2O2 is unstable and easily decomposed. BTA can cause post-CMP challenges, such as organic residue, toxicity and particle adhesion. We have been engaged in studying a weakly alkaline barrier slurry without oxidizer and benzotriazole. Based on these works, the objective of this paper is to discuss the mechanism of the development of the barrier slurry without oxidizer and benzotriazole by studying the effects of the different components (containing colloidal silica, FA/O complexing agent, pH of polishing solution and guanidine nitrate) on removal rate selectivity. The possible related polishing mechanism has also been proposed. Project supported by the Major National Science and Technology Special Projects (No. 2009ZX02308), the National Natural Science Foundation of Hebei Province, China (No. E2013202247), and the Department of Education-Funded Research Projects of Hebei Province, China (No. QN2014208).

Effect of Molecular Structure on Modulation of Passivation Films on Copper Chemical Mechanical Planarization

NASA Astrophysics Data System (ADS)

Mlynarski, Amy

In order to optimize the chemical mechanical planarization (CMP) process, there is a need to further understand the synergistic relationship between chemical and mechanical parameters to enhance the polishing process. CMP chemistry is very complex, as it contains complexing agents, oxidizing agents, passivating agents, and abrasive particles. This variety of components ensues chaos within the system, which complicates the understanding of the direct impact each component has on the CMP process. In order for there to be efficiency in the polishing process, specifically for copper (Cu) polishing, the chemistry must create a softened passivation layer on the Cu surface that is able to be readily removed by applied mechanical abrasion. Focusing on Cu CMP, the oxidation of Cu to Cu2+ needs to be thoroughly understood in order to probe the formation of creating this ideal passivated layer, which protects recessed Cu regions. The type of film that is formed, the strength of the film, and even the efficiency of film removal will be altered depending on the chemistry of interaction at the Cu surface. This thesis focuses on understanding the working mechanism of the film formation on Cu, depending on the passivating agent added to the system. The different passivating agents used, more specifically benzotriazole (BTA), triazole (TAZ), salicylhydroxamic acid (SHA), and benzimidazole (BIA), have all been known to create a light coat of protection on the recessed metal, providing corrosion resistance. In order to study the differences in these films, many different techniques can be utilized to characterize the films, such as electrochemical scans, referred to as Tafel plots, which will be performed to compare the differences of the films. By altering the temperature within the system, the activation energy for each system can also be determined as another way to characterize the density of the passive film formed. Furthermore, the generation of *OH will be monitored since the formation of *OH is imperative for catalyzing the Cu-amino acid complexes, necessary for obtaining adequate removal rates. The amount of *OH generated from each system would have a direct correlation to the polishing performance for the different systems. Additionally, the effect of changing mechanical parameters or consumables used will alter the polish, more specifically the amount of friction generated during the polishes. This work discovered that when comparing all of the different types of inhibitors, there was a significant difference seen in the type of film formed as well as the stability of the film, strongly dependent on the concentration of the corrosion inhibitor. The calculated activation energy showed a direct correlation to the concentration of the corrosion inhibitor; more specifically, as the concentration of the inhibitor increases, so does the activation energy. By looking at the generated amount of *OH for the complexes, more specifically BTA and SHA, there is a minimal amount of *OH generated within the system compared to that of TAZ and BIA which resemble more like a system containing no inhibitor at all. This would once again show how the structure determines function of the inhibitor in regards to how the complex changes for the different molecules. The removal rates for these systems, both at 100 ppm and 500 ppm, show a strong correlation to the previously discussed activation energies. BTA shows extremely low removal rates, which seems to be diminished at even higher concentration, since the film created is so dense due to the pi-pi electron interactions. Similar trends are seen in the results from TAZ where the removal rates decrease as the concentration of the inhibitor increases. Furthermore, SHA shows significant material removal rates (MRR) at lower concentrations, but the rates are vastly different when increasing the concentration to 500 ppm. This could be because the complex that forms with the surface is a stable ring-like complex, but once enough inhibitor is added, the SHA complex covers the surface entirely, eliminating any chance of Cu-glycine interaction, which would promote removal rate. Unlike the other inhibitors, the removal rates for BIA show that as the concentration of the inhibitor increases, the removal rates significantly increase as well. Since this inhibitor forms a "weaker" complex, comparatively, the more inhibitor added would allow for more of the Cu-glycine interactions to take place.

Eddy current measurement of the thickness of top Cu film of the multilayer interconnects in the integrated circuit (IC) manufacturing process

NASA Astrophysics Data System (ADS)

Qu, Zilian; Meng, Yonggang; Zhao, Qian

2015-03-01

This paper proposes a new eddy current method, named equivalent unit method (EUM), for the thickness measurement of the top copper film of multilayer interconnects in the chemical mechanical polishing (CMP) process, which is an important step in the integrated circuit (IC) manufacturing. The influence of the underneath circuit layers on the eddy current is modeled and treated as an equivalent film thickness. By subtracting this equivalent film component, the accuracy of the thickness measurement of the top copper layer with an eddy current sensor is improved and the absolute error is 3 nm for sampler measurement.

Chemical Mechanical Polishing of Ruthenium, Cobalt, and Black Diamond Films

NASA Astrophysics Data System (ADS)

Peethala, Brown Cornelius

Ta/TaN bilayer serves as the diffusion barrier as well as the adhesion promoter between Cu and the dielectric in 32 nm technology devices. A key concern of future technology devices (<32 nm) for Cu interconnects is the extendibility of TaN/Ta/Cu-seed to sustain the diffusion barrier performance without forming voids and meeting the requirements of low resistivity. These are very challenging requirements for the Ta/TaN bilayer at a thickness of < 5 nm. Hence, ruthenium (Ru) and cobalt (Co), among these, are being considered for replacing Ta/TaN as barrier materials for Cu interconnects in future technology devices. Both are very attractive for reasons such as the capability of direct electroplating of Cu, lower resistivity and for a single layer (vs. a bilayer of Ta/TaN) to act as a barrier. During patterning, they need to be planarized using conventional chemical mechanical polishing (CMP) to achieve a planar surface. However, CMP of these new barrier materials requires novel slurry compositions that provide adequate selectivity towards Cu and dielectric films, and minimize galvanic corrosion. Apart from the application as a barrier, Ru also has been proposed as a lower electrode material in metal-insulator-metal capacitors where high (> 50 nm/min) Ru removal rates (RRs) are required and as a stop layer in magnetic recording head fabrication where low (< 1 nm/min) Ru RRs are desired. A Ru removal rate of ˜60 nm/min was achieved with a colloidal silica-based slurry at pH 9 using potassium periodate (KIO4) as the oxidizer. At this pH, toxic RuO4 does not form eliminating a major challenge in Ru CMP. This removal rate was obtained by increasing the solubility of KIO4 by adding potassium hydroxide (KOH). It was also determined that increased the ionic strength is not responsible for the observed increase in Ru removal rate. Benzotirazole (BTA) and ascorbic acid were added to the slurry to reduce the open circuit potential (Eoc) difference between Cu and Ru to ˜20 mV from about 550 mV in the absence of additives. A removal mechanism with KIO4 as the oxidizing agent is proposed based on the formation of several ruthenium oxides, some of which formed residues on the polishing pad below a pH of ˜7. Next, a colloidal silica-based slurry with hydrogen peroxide (H 2O2) as the oxidizer (1 wt%), and arginine (0.5 wt%) as the complexing agent was developed to polish Co at pH 10. The Eoc between Cu and Co at the above conditions was reduced to ˜20 mV compared to ˜250 mV in the absence of additives, suggestive of reduced galvanic corrosion during the Co polishing. The slurry also has the advantages of good post-polish surface quality at pH 10, and no dissolution rate. BTA at a concentration of 5mM in this slurry inhibited Cu dissolution rates and yielded a Cu/Co RR ratio of ˜0.8:1 while the open potential difference between Cu and Co was further reduced to ˜10 mV. The role of H2O2, complexing agent (arginine), silica abrasives, and Co removal mechanism during polishing is discussed. Also, during the barrier CMP, a part of the underlying low-k (SiCOH) material has to be polished to remove any modified surface film. Black Diamond (BD) is a SiCOH type material with a dielectric constant of ˜2.9 and here, polishing of BD was investigated in order to understand the polishing behavior of SiCOH-based materials using the barrier slurries. The slurries that were developed for polishing Co and Ru in this work and Ta/TaN (earlier) were investigated for polishing the Black Diamond (BD) films. Here, it was found that ionic salts play a major role in enhancing the BD RRs to ˜65 nm/min compared to no removal rates in the absence of additives. A removal mechanism in the presence of ionic salts is proposed.

Surface Wave Metrology for Copper/Low-k Interconnects

NASA Astrophysics Data System (ADS)

Gostein, M.; Maznev, A. A.; Mazurenko, A.; Tower, J.

2005-09-01

We review recent advances in the application of laser-induced surface acoustic wave metrology to issues in copper/low-k interconnect development and manufacturing. We illustrate how the metrology technique can be used to measure copper thickness uniformity on a range of features from solid pads to arrays of lines, focusing on specific processing issues in copper electrochemical deposition (ECD) and chemical-mechanical polishing (CMP). In addition, we review recent developments in surface wave metrology for the characterization of low-k dielectric elastic modulus, including the ability to measure within-wafer uniformity of elastic modulus and to characterize porous, anisotropic films.

Effects of the Physical Characteristics of Cerium Oxide on Plasma-Enhanced Tetraethylorthosiliate Removal Rate of Chemical Mechanical Polishing for Shallow Trench Isolation

NASA Astrophysics Data System (ADS)

Kim, Sang-Kyun; Paik, Ungyu; Oh, Seong-Geun; Park, Yong-Kook; Katoh, Takeo; Park, Jea-Gun

2003-03-01

Ceria powders were synthesized by two different methods, solid-state displacement reaction and wet chemical precipitation, and the influence of the physical characteristics of cerium oxide on the removal rate of plasma-enhanced tetraethylorthosilicate (PETEOS) and chemical vapor deposition (CVD) nitride films in chemical mechanical planarization (CMP) was investigated. The fundamental physicochemical property and electrokinetic behavior of ceria particles in aqueous suspending media were investigated to identify the correlation between the colloidal property of ceria and the CMP performance. The surface potentials of two different ceria particles are found to have different isoelectric point (pHiep) values and differences in physical properties of ceria particles such as porosity and density were found to be the key parameters in CMP of PETEOS films. Ceria powders synthesized by the solid-state displacement reaction method yielded a higher removal rate of PETEOS and higher selectivity than powders synthesized by the wet chemical precipitation method.

SCAMPI Lead Appraiser (Service Mark) Body of Knowledge (SLA BOK)

DTIC Science & Technology

2007-10-01

CMP 6.4.2, Understanding business goals and concerns as they impact process judgments • CMP 6.5.4, Recommending next steps for process improvement...Applying practice characterization and rating rules CMP 6.4.2 Understanding business goals and concerns as they impact process judgments Associated...judgments CMP 6.4.2* Understanding business goals and concerns as they impact process judgments CMP 6.4.3 Conducting preliminary findings

Method for selective CMP of polysilicon

NASA Technical Reports Server (NTRS)

Babu, Suryadevara V. (Inventor); Natarajan, Anita (Inventor); Hegde, Sharath (Inventor)

2010-01-01

A method of removing polysilicon in preference to silicon dioxide and/or silicon nitride by chemical mechanical polishing. The method removes polysilicon from a surface at a high removal rate while maintaining a high selectivity of polysilicon to silicon dioxide and/or a polysilicon to silicon nitride. The method is particularly suitable for use in the fabrication of MEMS devices.

Ellipsometry-like analysis of polarization state for micro cracks using stress-induced light scattering method

NASA Astrophysics Data System (ADS)

Sakata, Yoshitaro; Terasaki, Nao; Sakai, Kazufumi; Nonaka, Kazuhiro

2016-03-01

Fine polishing techniques, such as chemical mechanical polishing (CMP), are important to glass substrate manufacturing. When these techniques involve mechanical interaction in the form of friction between the abrasive and the substrate surface during polishing, latent flaws may form on the product. Fine polishing induced latent flaws in glass substrates may become obvious during a subsequent cleaning process if the glass surface is eroded away by chemical interaction with a cleaning liquid. Thus, latent flaws reduce product yield. A novel technique (the stress-induced light scattering method; SILSM) which was combined with light scattering method and stress effects was proposed for inspecting surface to detect polishing induced latent flaws. This method is able to distinguish between latent flaws and tiny particles on the surface. In this method, an actuator deforms a sample inducing stress effects around the tip of a latent flaw caused by the deformation, which in turn changes the refractive index of the material around the tip of the latent flaw because of the photoelastic effect. A CCD camera detects this changed refractive index as variations in light-scattering intensity. In this study, the changes in reflection coefficients and polarization states after application of stress to a glass substrate were calculated and evaluated qualitatively using Jones matrix-like ellipsometry. As the results, it was shown that change in the polarization states around the tip of latent flaw were evaluated between before and after applied stress, qualitatively.

Integration of Porogen-Based Low-k Films: Influence of Capping Layer Thickness and Long Thermal Anneals on Low-k Damage and Reliability

NASA Astrophysics Data System (ADS)

De Roest, David; Vereecke, Bart; Huffman, Craig; Heylen, Nancy; Croes, Kristof; Arai, Hirofumi; Takamure, Noboru; Beynet, Julien; Sprey, Hessel; Matsushita, Kiyohiro; Kobayashi, Nobuyoshi; Verdonck, Patrick; Demuynck, Steven; Beyer, Gerald; Tokei, Zsolt; Struyf, Herbert

2010-05-01

This paper discusses integration aspects of a porous low-k film (k ˜2.45) cured with a broadband UV lamp. Different process splits are discussed which could contribute to avoid integration induced damage and improve reliability. The main factor contributing to a successful integration is the presence of a thick (protecting) cap layer partially remaining after chemical mechanical polishing (CMP), which leads to yielding structures with a keff of ˜2.6, a breakdown voltage of ˜6.9 MV/cm and time dependent dielectric breakdown (TDDB) lifetimes in the excess of 100 years. Long thermal anneals restore the k-value but degrade lifetime.

Electrochemical studies of Copper, Tantalum and Tantalum Nitride surfaces in aqueous solutions for applications in chemical-mechanical and electrochemical-mechanical planarization

NASA Astrophysics Data System (ADS)

Sulyma, Christopher Michael

This report will investigate fundamental properties of materials involved in integrated circuit (IC) manufacturing. Individual materials (one at a time) are studied in different electrochemical environmental solutions to better understand the kinetics associated with the polishing process. Each system tries to simulate a real CMP environment in order to compare our findings with what is currently used in industry. To accomplish this, a variety of techniques are used. The voltage pulse modulation technique is useful for electrochemical processing of metal and alloy surfaces by utilizing faradaic reactions like electrodeposition and electrodissolution. A theoretical framework is presented in chapter 4 to facilitate quantitative analysis of experimental data (current transients) obtained in this approach. A typical application of this analysis is demonstrated for an experimental system involving electrochemical removal of copper surface layers, a relatively new process for abrasive-free electrochemical mechanical planarization of copper lines used in the fabrication of integrated circuits. Voltage pulse modulated electrodissolution of Cu in the absence of mechanical polishing is activated in an acidic solution of oxalic acid and hydrogen peroxide. The current generated by each applied voltage step shows a sharp spike, followed by a double-exponential decay, and eventually attains the rectangular shape of the potential pulses. For the second system in chapter 5, open-circuit potential measurements, cyclic voltammetry and Fourier transform impedance spectroscopy have been used to study pH dependent surface reactions of Cu and Ta rotating disc electrodes (RDEs) in aqueous solutions of succinic acid (SA, a complexing agent), hydrogen peroxide (an oxidizer), and ammonium dodecyl sulfate (ADS, a corrosion inhibitor for Cu). The surface chemistries of these systems are relevant for the development of a single-slurry approach to chemical mechanical planarization (CMP) of Cu lines and Ta barriers in the fabrication of semiconductor devices. It is shown that in non-alkaline solutions of H2O2, the SA-promoted surface complexes of Cu and Ta can potentially support chemically enhanced material removal in low-pressure CMP of surface topographies overlying fragile low-k dielectrics. ADS can suppress Cu dissolution without significantly affecting the surface chemistry of Ta. Chapter 6 discusses anodic corrosion of Ta, which is examined as a possible route to voltage induced removal of Ta for potential applications in electrochemical mechanical planarization (ECMP) of diffusion barriers. This strategy involves electro-oxidation of Ta in the presence of NO3- anions to form mechanically weak surface oxide films, followed by removal of the oxide layers by moderate mechanical abrasion. This NO3 - system is compared with a reference solution of Br -. In both electrolytes, the voltammetric currents of anodic oxidation exhibit oscillatory behaviors in the initial cycles of slow (5 mV s-1) voltage scans. The frequencies of these current oscillations are show signature attributes of localized pitting or general surface corrosion caused by Br- or NO3 -, respectively. Scanning electron microscopy, cyclic voltammetry, polarization resistance measurements, and time resolved Fourier transform impedance spectroscopy provide additional details about these corrosion mechanism. Apart from their relevance in the context of ECMP, the results also address certain fundamental aspects of pitting and general corrosions. The general protocols necessary to combine and analyze the results of D.C. and A.C. electrochemical measurements involving such valve metal corrosion systems are discussed in detail. In chapter 7 potassium salts of certain oxyanions (nitrate, sulfate and phosphate in particular) are shown to serve as effective surface-modifying agents in chemically enhanced, low-pressure chemical mechanical planarization (CMP) of Ta and TaN barrier layers for interconnect structures. The surface reactions that form the basis of this CMP strategy are investigated here in detail using the electrochemical techniques of cyclic voltammetry, open circuit potential analysis, polarization resistance measurements, and Fourier transform impedance spectroscopy. The results suggest that forming structurally weak oxide layers on the CMP samples is a key to achieving the goal of chemically controlled CMP of Ta/TaN at low down-pressures. (Abstract shortened by UMI.)

Method for one-to-one polishing of silicon nitride and silicon oxide

NASA Technical Reports Server (NTRS)

Babu, Suryadevara V. (Inventor); Natarajan, Anita (Inventor)

2009-01-01

The present invention provides a method of removing silicon nitride at about the same removal rate as silicon dioxide by CMP. The method utilizes a polishing slurry that includes colloidal silica abrasive particles dispersed in water and additives that modulate the silicon dioxide and silicon nitride removal rates such that they are about the same. In one embodiment of the invention, the additive is lysine or lysine mono hydrochloride in combination with picolinic acid, which is effective at a pH of about 8. In another embodiment of the invention, the additive is arginine in combination with picolinic acid, which is effective at a pH of about 10.

The performances of different overlay mark types at 65nm node on 300-mm wafers

NASA Astrophysics Data System (ADS)

Tseng, H. T.; Lin, Ling-Chieh; Huang, I. H.; Lin, Benjamin S.; Huang, Chin-Chou K.; Huang, Chien-Jen

2005-05-01

The integrated circuit (IC) manufacturing factories have measured overlay with conventional "box-in-box" (BiB) or "frame-in-frame" (FiF) structures for many years. Since UMC played as a roll of world class IC foundry service provider, tighter and tighter alignment accuracy specs need to be achieved from generation to generation to meet any kind of customers' requirement, especially according to International Technology Roadmap for Semiconductors (ITRS) 2003 METROLOGY section1. The process noises resulting from dishing, overlay mark damaging by chemical mechanism polishing (CMP), and the variation of film thickness during deposition are factors which can be very problematic in mark alignment. For example, the conventional "box-in-box" overlay marks could be damaged easily by CMP, because the less local pattern density and wide feature width of the box induce either dishing or asymmetric damages for the measurement targets, which will make the overlay measurement varied and difficult. After Advanced Imaging Metrology (AIM) overlay targets was introduced by KLA-Tencor, studies in the past shown AIM was more robust in overlay metrology than conventional FiF or BiB targets. In this study, the applications of AIM overlay marks under different process conditions will be discussed and compared with the conventional overlay targets. To evaluate the overlay mark performance against process variation on 65nm technology node in 300-mm wafer, three critical layers were chosen in this study. These three layers were Poly, Contact, and Cu-Metal. The overlay targets used for performance comparison were BiB and Non-Segmented AIM (NS AIM) marks. We compared the overlay mark performance on two main areas. The first one was total measurement uncertainty (TMU)3 related items that include Tool Induced Shift (TIS) variability, precision, and matching. The other area is the target robustness against process variations. Based on the present study AIM mark demonstrated an equal or better performance in the TMU related items under our process conditions. However, when non-optimized tungsten CMP was introduced in the tungsten contact process, due to the dense grating line structure design, we found that AIM mark was much more robust than BiB overlay target.

Exposure Characteristics of Nanoparticles as Process By-products for the Semiconductor Manufacturing Industry.

PubMed

Choi, Kwang-Min; Kim, Jin-Ho; Park, Ju-Hyun; Kim, Kwan-Sick; Bae, Gwi-Nam

2015-01-01

This study aims to elucidate the exposure properties of nanoparticles (NPs; <100 nm in diameter) in semiconductor manufacturing processes. The measurements of airborne NPs were mainly performed around process equipment during fabrication processes and during maintenance. The number concentrations of NPs were measured using a water-based condensation particle counter having a size range of 10-3,000 nm. The chemical composition, size, and shape of NPs were determined by scanning electron microscopy and transmission electron microscopy techniques equipped with energy dispersive spectroscopy. The resulting concentrations of NPs ranged from 0.00-11.47 particles/cm(3). The concentration of NPs measured during maintenance showed a tendency to increase, albeit incrementally, compared to that measured during normal conditions (under typical process conditions without maintenance). However, the increment was small. When comparing the mean number concentration and standard deviation (n ± σ) of NPs, the chemical mechanical polishing (CMP) process was the highest (3.45 ± 3.65 particles/cm(3)), and the dry etch (ETCH) process was the lowest (0.11 ± 0.22 particles/cm(3)). The major NPs observed were silica (SiO2) and titania (TiO2) particles, which were mainly spherical agglomerates ranging in size from 25-280 nm. Sampling of semiconductor processes in CMP, chemical vapor deposition, and ETCH reveled NPs were <100 nm in those areas. On the other hand, particle size exceeded 100 nm in diffusion, metallization, ion implantation, and wet cleaning/etching process. The results show that the SiO2 and TiO2 are the major NPs present in semiconductor cleanroom environments.

Affinity chromatography matrices for depletion and purification of casein glycomacropeptide from bovine whey.

PubMed

Baieli, María F; Urtasun, Nicolás; Martinez, María J; Hirsch, Daniela B; Pilosof, Ana M R; Miranda, María V; Cascone, Osvaldo; Wolman, Federico J

2017-01-01

Casein glycomacropeptide (CMP) is a 64- amino acid peptide found in cheese whey, which is released after κ-casein specific cleavage by chymosin. CMP lacks aromatic amino acids, a characteristic that makes it usable as a nutritional supplement for people with phenylketonuria. CMP consists of two nonglycosylated isoforms (aCMP A and aCMP B) and its different glycosylated forms (gCMP A and gCMP B). The most predominant carbohydrate of gCMP is N-acetylneuraminic acid (sialic acid). Here, we developed a CMP purification process based on the affinity of sialic acid for wheat germ agglutinin (WGA). After formation of chitosan beads and adsorption of WGA, the agglutinin was covalently attached with glutaraldehyde. Two matrices with different WGA density were assayed for CMP adsorption. Maximum adsorption capacities were calculated according to the Langmuir model from adsorption isotherms developed at pH 7.0, being 137.0 mg/g for the matrix with the best performance. In CMP reduction from whey, maximum removal percentage was 79% (specifically 33.7% of gCMP A and B, 75.8% of aCMP A, and 93.9% of aCMP B). The CMP was recovered as an aggregate with an overall yield of 64%. Therefore, the matrices developed are promising for CMP purification from cheese whey. © 2016 American Institute of Chemical Engineers Biotechnol. Prog., 33:171-180, 2017. © 2016 American Institute of Chemical Engineers.

SEMICONDUCTOR TECHNOLOGY A new cleaning process for the metallic contaminants on a post-CMP wafer's surface

NASA Astrophysics Data System (ADS)

Baohong, Gao; Yuling, Liu; Chenwei, Wang; Yadong, Zhu; Shengli, Wang; Qiang, Zhou; Baimei, Tan

2010-10-01

This paper presents a new cleaning process using boron-doped diamond (BDD) film anode electrochemical oxidation for metallic contaminants on polished silicon wafer surfaces. The BDD film anode electrochemical oxidation can efficiently prepare pyrophosphate peroxide, pyrophosphate peroxide can oxidize organic contaminants, and pyrophosphate peroxide is deoxidized into pyrophosphate. Pyrophosphate, a good complexing agent, can form a metal complex, which is a structure consisting of a copper ion, bonded to a surrounding array of two pyrophosphate anions. Three polished wafers were immersed in the 0.01 mol/L CuSO4 solution for 2 h in order to make comparative experiments. The first one was cleaned by pyrophosphate peroxide, the second by RCA (Radio Corporation of America) cleaning, and the third by deionized (DI) water. The XPS measurement result shows that the metallic contaminants on wafers cleaned by the RCA method and by pyrophosphate peroxide is less than the XPS detection limits of 1 ppm. And the wafer's surface cleaned by pyrophosphate peroxide is more efficient in removing organic carbon residues than RCA cleaning. Therefore, BDD film anode electrochemical oxidation can be used for microelectronics cleaning, and it can effectively remove organic contaminants and metallic contaminants in one step. It also achieves energy saving and environmental protection.

The study on the effect of pattern density distribution on the STI CMP process

NASA Astrophysics Data System (ADS)

Sub, Yoon Myung; Hian, Bernard Yap Tzen; Fong, Lee It; Anak, Philip Menit; Minhar, Ariffin Bin; Wui, Tan Kim; Kim, Melvin Phua Twang; Jin, Looi Hui; Min, Foo Thai

2017-08-01

The effects of pattern density on CMP characteristics were investigated using specially designed wafer for the characterization of pattern-dependencies in STI CMP [1]. The purpose of this study is to investigate the planarization behavior based on a direct STI CMP used in cerium (CeO2) based slurry system in terms of pattern density variation. The minimal design rule (DR) of 180nm generation technology node was adopted for the mask layout. The mask was successfully applied for evaluation of a cerium (CeO2) abrasive based direct STI CMP process. In this study, we described a planarization behavior of the loading-effects of pattern density variation which were characterized with layout pattern density and pitch variations using masks mentioned above. Furthermore, the characterizing pattern dependent on the variations of the dimensions and spacing features, in thickness remaining after CMP, were analyzed and evaluated. The goal was to establish a concept of library method which will be used to generate design rules reducing the probability of CMP-related failures. Details of the characterization were measured in various layouts showing different pattern density ranges and the effects of pattern density on STI CMP has been discussed in this paper.

Effect of 1,2,4-triazole on galvanic corrosion between cobalt and copper in CMP based alkaline slurry

NASA Astrophysics Data System (ADS)

Fu, Lei; Liu, Yuling; Wang, Chenwei; Han, Linan

2018-04-01

Cobalt has become a new type of barrier material with its unique advantages since the copper-interconnects in the great-large scale integrated circuits (GLSI) into 10 nm and below technical nodes, but cobalt and copper have severe galvanic corrosion during chemical–mechanical flattening. The effect of 1,2,4-triazole on Co/Cu galvanic corrosion in alkaline slurry and the control of rate selectivity of copper and cobalt were investigated in this work. The results of electrochemical experiments and polishing experiments had indicated that a certain concentration of 1,2,4-triazole could form a layer of insoluble and dense passive film on the surface of cobalt and copper, which reduced the corrosion potential difference between cobalt and copper. Meantime, the removal rate of cobalt and copper could be effectively controlled according to demand during the CMP process. When the study optimized slurry was composed of 0.5 wt% colloidal silica, 0.1 %vol. hydrogen peroxide, 0.05 wt% FA/O, 345 ppm 1,2,4-triazole, cobalt had higher corrosion potential than copper and the galvanic corrosion could be reduced effectively when the corrosion potential difference between them decreased to 1 mV and the galvanic corrosion current density reached 0.02 nA/cm2. Meanwhile, the removal rate of Co was 62.396 nm/min, the removal rate of Cu was 47.328 nm/min, so that the removal rate ratio of cobalt and copper was 1.32 : 1, which was a good amendment to the dishing pits. The contact potential corrosion of Co/Cu was very weak, which could be better for meeting the requirements of the barrier CMP. Project supported by the Major National Science and Technology Special Projects (No. 2016ZX02301003-004-007), the Natural Science Foundation of Hebei Province, China (No. F2015202267), and the Outstanding Young Science and Technology Innovation Fund of Hebei University of Technology (No. 2015007).

Dissolved air flotation of polishing wastewater from semiconductor manufacturer.

PubMed

Liu, J C; Lien, C Y

2006-01-01

The feasibility of the dissolved air flotation (DAF) process in treating chemical mechanical polishing (CMP) wastewater was evaluated in this study. Wastewater from a local semiconductor manufacturer was sampled and characterised. Nano-sized silica (77.6 nm) with turbidity of 130 +/- 3 NTU was found in the slightly alkaline wastewater with traces of other pollutants. Experimental results indicated removal efficiency of particles, measured as suspended particle or turbidity, increased with increasing concentration of cationic collector cetyltrimethyl ammonium bromide (CTAB). When CTAB concentration was 30 mg/L, pH of 6.5 +/- 0.1 and recycle ratio of 30%, very effective removal of particles (> 98%) was observed in saturation pressure range of 4 to 6 kg/cm2, and the reaction proceeded faster under higher pressure. Similarly, the reaction was faster under the higher recycle ratio, while final removal efficiency improved slightly as the recycle ratio increased from 20 to 40%. An insignificant effect of pH on treatment efficiency was found as pH varied from 4.5 to 8.5. The presence of activator, Al3+ and Fe3+, enhanced the system performance. It is proposed that CTAB adsorbs on silica particles in polishing wastewater through electrostatic interaction and makes particles more hydrophobic. The increase in hydrophobicity results in more effective bubble-particle collisions. In addition, flocculation of silica particles through bridging effect of collector was found; it is believed that flocculation of particles also contributed to flotation. Better attachment between gas bubble and solid, higher buoyancy and higher air to solid ratio all lead to effective flotation.

Chemical-mechanical planarization of aluminum and copper interconnects with magnetic liners

NASA Astrophysics Data System (ADS)

Wang, Bin

2000-10-01

Chemical Mechanical Planarization (CMP) has been employed to achieve Damascene patterning of aluminum and copper interconnects with unique magnetic liners. A one-step process was developed for each interconnect scheme, using a double-layered pad with mesh cells, pores, and perforations on a top hard layer. In a hydrogen peroxide-based slurry, aluminum CMP was a process of periodic removal and formation of a surface oxide layer. Cu CMP in the same slurry, however, was found to be a dissolution dominant process. In a potassium iodate-based slurry, copper removal was the result of two competing reactions: copper dissolution and a non-native surface layer formation. Guided by electrochemistry, slurries were developed to remove nickel in different regimes of the corrosion kinetics diagram. Nickel CMP in a ferric sulfate-based slurry resulted in periodic removal and formation of a passive surface layer. In a potassium permanganate-based slurry, nickel removal is a dissolution dominant process. Visible Al(Cu) surface damages obtained with copper-doped aluminum could be eliminated by understanding the interactions between the substrate, the pad, and the abrasive agglomerate. Increasing substrate hardness by annealing prior to CMP led to a surface finish free of visible scratches. A similar result was also obtained by preventing formation of abrasive agglomerates and minimizing their contact with the substrate.

Experimental Studies of Selected Aqueous Electrochemical Systems Relevant for Materials Processing in the Fabrications of Microelectronic Components and Direct Alcohol Fuel Cells

NASA Astrophysics Data System (ADS)

Shi, Xingzhao

A broad range of electrochemical techniques are employed in this dissertation to investigate a selected set of aqueous electrochemical systems that are relevant for materials processing in the fabrication of microelectronic devices and direct alcohol fuel cells. In terms of technical applications, this work covers three main experimental systems: (i) chemical mechanical planarization (CMP), (ii) electro-less nickel deposition, and (iii) direct alkaline glycerol fuel cells. The first two areas are related to electronic device fabrications and the third topic is related to cost-effective energy conversion. The common electrochemical aspect of these different systems is that, in all these cases the active material characteristics are governed by complex (often multi-step) reactions occurring at metal-liquid (aqueous) interfaces. Electro-analytical techniques are ideally suited for studying the detailed mechanisms of such reactions, and the present investigation is largely focused on developing adequate analytical strategies for probing these reaction mechanisms. In the fabrication of integrated circuits, certain steps of materials processing involve CMP of Al deposited on thin layers of diffusion barrier materials like Ta/TaN, Co, or Ti/TiN. A specific example of this situation is found in the processing of replacement metal gates used for high-k/metal-gate transistors. Since the commonly used barrier materials are nobler than Al, the Al interface in contact with the barrier can become prone to galvanic corrosion in the wet CMP environment. Using model systems of coupon electrodes and two specific barrier metals, Ta and Co, the electrochemical factors responsible for these corrosion effects are investigated here in a moderately acidic (pH = 4.0) abrasive-free solution. The techniques of cyclic voltammetry and impedance spectroscopy are combined with strategic measurements of galvanic currents and open circuit potentials (OCPs). L-ascorbic acid (AA) is employed as a surface modifying agent for controlling galvanic corrosions of Al in the Ta-Al and Co-Al bimetallic combinations. The results elaborate the chemical and electrochemical mechanisms responsible for activating and suppressing the corrosion processes in these systems. Defect-control is a critical requirement for CMP of the ultrathin diffusion barriers considered for the new Cu-interconnects. The challenging task of developing advanced CMP slurries for such systems can be aided by electrochemical evaluations of model CMP schemes under tribological conditions. The present work uses this strategy to characterize an alkaline slurry formulation aimed at minimizing galvanic corrosion in the CMP systems involving Ru, Ta (barrier metals) and Cu (wiring metal). This slurry is based on percarbonate and guanidine additives, and the test metals are polycrystalline disc samples. A particular goal of this study is to explore the essential analytical aspects of evaluating CMP systems in the tribo-electrochemical approach. The CMP specific surface reactions are characterized by potentiodynamic polarization and open circuit voltage measurements, performed both in the presence and in the absence of polishing, and by employing abrasive free as well as abrasive (colloidal SiO 2) added solutions. The findings of these experiments are further checked by using impedance spectroscopy. The electrochemical mixed potential steps of the CMP promoting reactions are analyzed, and the removable surface species formed by these reactions are discussed. Electro-oxidation of hypophosphite plays an important role in the electro-less deposition of Ni used to fabricate surface engineered films, alloys, and coatings for a variety of applications. At the same time, the kinetic details of this oxidation reaction comprise an ideal framework for studying many general mechanistic aspects of electrocatalysis on transition metal substrates. The present study utilizes these specific attributes of hypophosphite oxidation to probe the underlying function of the incipient hydrous oxide of Ni in promoting the catalytic properties of this metal in an alkaline medium. The experiments reported here use time-resolved Fourier-transform electrochemical impedance spectroscopy (FT-EIS), strategically coupled with scan-rate controlled voltammetry. The results suggest that the incipient hydrous oxide Ni(OH)ad formed at the onset of hypophosphite oxidation catalytically promotes the latter's precursor de-hydrogenation step. While voltammetry provides suggestive evidence for these Ni(OH)ad induced effects, the FT-EIS data serve to gather more direct signatures of the catalytic function of Ni(OH)ad. The mechanism of energy conversion in a direct glycerol fuel cell (DGFC) is governed by the anode-supported heterogeneous steps of glycerol electro-oxidation. In aerated alkaline electrolytes, glycerol also participates in a base catalyzed process, which can release certain species mixing with the anode catalyzed surface products. As a result, selective probing of the surface catalytic reactions involving such systems can be difficult. The present work addresses this issue for a gold anode by using the analytical capability of cyclic voltammetry (CV). In addition, surface plasmon resonance measurements are used to optically probe the adsorption characteristics of the electrolyte species. The net exchange current of the oxidation process and the transfer coefficient of the rate determining step are evaluated by analyzing the CV data. The interfacial reactions and their products on Au are identified by measuring the number of electrons released during the electro-oxidation of glycerol. The results indicate that these reactions are facilitated by the surface bound hydroxyl species on Au (chemisorbed OH-- and faradaically formed Au-OH). By comparing the findings for stationary and rotating electrodes, it is shown that, convective mass transport is critical to maintaining efficient progression of the consecutive oxidation steps of glycerol. In the absence of hydrodynamic support, the main surface products of glycerol oxidation appear to be glyceraldehyde, glycerate and malonate, formed through a net six-electron route. In the presence of controlled convection, a ten-electron process is activated, where mesaxolate is the likely additional product.

Dynamic NMR Study of Model CMP Slurry Containing Silica Particles as Abrasives

NASA Astrophysics Data System (ADS)

Odeh, F.; Al-Bawab, A.; Li, Y.

2018-02-01

Chemical mechanical planarization (CMP) should provide a good surface planarity with minimal surface defectivity. Since CMP slurries are multi-component systems, it is very important to understand the various processes and interactions taking place in such slurries. Several techniques have been employed for such task, however, most of them lack the molecular recognition to investigate molecular interactions without adding probes which in turn increase complexity and might alter the microenvironment of the slurry. Nuclear magnetic resonance (NMR) is a powerful technique that can be employed in such study. The longitudinal relaxation times (T1) of the different components of CMP slurries were measured using Spin Echo-NMR (SE-NMR) at a constant temperature. The fact that NMR is non-invasive and gives information on the molecular level gives more advantage to the technique. The model CMP slurry was prepared in D2O to enable monitoring of T1 for the various components' protons. SE-NMR provide a very powerful tool to study the various interactions and adsorption processes that take place in a model CMP silica based slurry which contains BTA and/or glycine and/or Cu+2 ions. It was found that BTA is very competitive towards complexation with Cu+2 ions and BTA-Cu complex adsorbs on silica surface.

Fate of 1-(1',4'-cyclohexadienyl)-2-methylaminopropane (CMP) in soil: route-specific by-product in the clandestine manufacture of methamphetamine.

PubMed

Pal, Raktim; Megharaj, Mallavarapu; Kirkbride, K Paul; Naidu, Ravi

2012-02-01

We investigated the fate of 1-(1',4'-cyclohexadienyl)-2-methylaminopropane (CMP) in soil. CMP is the major route-specific byproduct in the clandestine manufacture of methamphetamine (MAP) by the use of excess alkali metal (e.g., lithium) in liquid ammonia, which is commonly referred to as the "Nazi method". This is one of the most common methods used in many countries for the illicit production of MAP. Knowledge on the fate of CMP in the terrestrial environment is essential to combat potential threats arising from illegal dumping of clandestine laboratory wastes. We report on the sorption-desorption, degradation, and metabolism patterns of CMP in three South Australian soils investigated in laboratory scale. CMP sorption in the test soils followed a Freundlich isotherm in the concentration range of 5 to 100μgmL(-1). Degradation studies showed that CMP was fairly unstable in both non-sterile and sterile soils, with half-life values typically less than one week. The role of biotic and abiotic soil processes in the degradation of CMP also varied significantly between the different soils, and with the length of the incubation period. Interestingly, but not surprisingly, the results showed that the CMP was not actually degraded to any simpler compounds but transformed to more persistent MAP. Thus, the main concern with Nazi method is the potential hazard from MAP rather than CMP if wastes are disposed of into the environment. Copyright © 2011 Elsevier B.V. All rights reserved.

Material Characterization in the Electro-Analytic Approach for Applications in Chemical Mechanical Planarization and Electrochemical Energy Systems

NASA Astrophysics Data System (ADS)

Rock, Simon E.

The work presented in this thesis covers electro-analytical characterization for multiple applications in material science. Electrochemical techniques were used to investigate soluble film formation on metals used in chemical mechanical planarization in order to better understand the removal rate process by studying new chemicals proposed by groups in industry. Second, an ionic liquid was used as an electrolyte in a lithium ion cathode half cell to show the essential functionality of the IL and the temperature advantage over traditional electrolytes. Lastly, a comprehensive measurement for charge recombination in dye-sensitized solar cells was performed using both open-circuit voltage decay and impedance spectroscopy, which may be used to better understand the limiting factors that affect the cell's efficiently. Electrochemical techniques were applied to new methods and materials to extend the development of material manufacturing and advance the measurement process. The fabrication of interconnect structures for semiconductor devices requires low down-pressure chemical mechanical planarization (CMP) of Ta barrier layers. Guanidine carbonate (GC) serves as an effective surface-complexing agent for such CMP applications, where the rate of Ta removal can be chemically controlled through pH-tuned selectivity with respect to the removal of Cu lines. Electrochemical techniques are employed in this work to study the surface-modifying roles of GC that make this chemical an attractive complexing agent for Ta CMP. In addition, the effects of including H2O2 (an oxidizer) and dodecyl benzene sulfonic acid (DBSA, a dissolution inhibitor for Cu) in GC-based CMP solutions are investigated to examine the selective CMP mechanisms of Ta and Cu in these solutions. The results suggest that the removal of Ta is supported in part by structurally weak guanidinium-tantalic-acid surface complexes formed on Ta/Ta2O5. The bicarbonate/carbonate anions of GC also facilitate Ta removal through the generation of ion-incorporated tantalum pentoxide. DBSA strongly affects the CMP chemistry of Cu, but exhibits relatively weaker effects on the surface activity of Ta, and thus plays a vital role in dictating the selectivity of Ta:Cu polish rates. CMP of tantalum nitride is also an essential step of material processing in the fabrication of integrated circuits, which is looked separately in this thesis. The present work investigates certain chemical aspects of this strategy of TaN-CMP by also using guanidine carbonate (GC) as a surface complexing agent, and employing electrochemical experiments. The experiments are designed to study the chemical and electrochemical origins of the CMP-specific surface complex films formed on a TaN wafer in acidic solutions of GC and hydrogen peroxide. Open circuit potential, polarization resistance, and electrochemical impedance measurements are employed to probe the surface effects that facilitate material removal in chemically prevailing CMP of TaN. The results are discussed in view of designing slurry variables to support barrier layer planarization with reduced roles of mechanical abrasion. Nonvolatile and nonflammable ionic liquids (ILs) have distinct thermal advantages over the traditional organic solvent electrolytes of lithium ion batteries. However, this beneficial feature of ILs is often counterbalanced by their high viscosity (a limiting factor for ionic conductivity) and, sometimes, by their unsuitable electrochemistry for generating protective layers on electrode surfaces. In an effort to alleviate these limiting Aspects of ILs, we have synthesized a PEGylated imidazolium bis(triflouromethylsulfonyl)amide (bistriflamide) IL that exhibited better thermal and electrochemical stability than a conventional electrolyte based on a blend of ethylene carbonate and diethyl carbonate. The electrochemical performance of this IL has been demonstrated using a cathode consisting of ball-milled LiMn2O4 particles. A direct comparison of the ionic liquid electrolyte with the nonionic low-viscosity conventional solvent blend is presented. Charge recombination at the electrolyte-photoanode interface of a dye sensitized solar cell (DSSC) is a major efficiency-limiting factor of the cell. To mitigate this recombination effect it is necessary to ensure that the effective electron lifetime in the DSSC is longer than the electron's transit time across the photoanode of mesoporous TiO2. While the efforts aimed at accomplishing this goal are often based on new materials/designs of photoanodes, a quantitative evaluation of these designs relies on the precision of the benchmarking measurements of electron lifetimes. The open circuit voltage decay (OCVD) technique offers an effective yet straightforward method for such measurements. The present work focuses on certain experimental criteria for ensuring the accuracy of these experiments, and probes the associated effects of temperature variations in the solar cell. The results demonstrate that, a high rate of data sampling is essential for adequately resolving the fast initial stages of charge recombination. The results also show the effects of nonlinear recombination where second order OCV variations are operative. The findings of the OCVD experiments are compared with a parallel set of tests carried out using impedance spectroscopy. The relative roles of the two sets of analytical measurements are examined.

Dependence of Non-Prestonian Behavior of Ceria Slurry with Anionic Surfactant on Abrasive Concentration and Size in Shallow Trench Isolation Chemical Mechanical Polishing

NASA Astrophysics Data System (ADS)

Kang, Hyun‑Goo; Kim, Dae‑Hyeong; Katoh, Takeo; Kim, Sung‑Jun; Paik, Ungyu; Park, Jea‑Gun

2006-05-01

The dependencies of the non-Prestonian behavior of ceria slurry with anionic surfactant on the size and concentration of abrasive particles were investigated by performing chemical mechanical polishing (CMP) experiments using blanket wafers. We found that not only the abrasive size but also the abrasive concentration with surfactant addition influences the non-Prestonian behavior. Such behavior is clearly exhibited with small abrasive sizes and a higher concentrations of abrasives with surfactant addition, because the abrasive particles can locally contact the film surface more effectively with applied pressure. We introduce a factor to quantify these relations with the non-Prestonian behavior of a slurry. For ceria slurry, this non-Prestonian factor, βNP, was determined to be almost independent of the abrasive concentration for a larger size and a smaller weight conentration of abrasive particles, but it increased with the surfactant concentration for a smaller size and a higher concentration of abrasives with surfactant addition.

A Designed Angiopoietin-1 Variant, Dimeric CMP-Ang1 Activates Tie2 and Stimulates Angiogenesis and Vascular Stabilization in N-glycan Dependent Manner

PubMed Central

Oh, Nuri; Kim, Kangsan; Jin Kim, Soo; Park, Intae; Lee, Jung-Eun; Suk Seo, Young; Joo An, Hyun; Min Kim, Ho; Young Koh, Gou

2015-01-01

Angiopoietin-1 (Ang1), a potential growth factor for therapeutic angiogenesis and vascular stabilization, is known to specifically cluster and activate Tie2 in high oligomeric forms, which is a unique and essential process in this ligand-receptor interaction. However, highly oligomeric native Ang1 and Ang1 variants are difficult to produce, purify, and store in a stable and active form. To overcome these limitations, we developed a simple and active dimeric CMP-Ang1 by replacing the N-terminal of native Ang1 with the coiled-coil domain of cartilage matrix protein (CMP) bearing mutations in its cysteine residues. This dimeric CMP-Ang1 effectively increased the migration, survival, and tube formation of endothelial cells via Tie2 activation. Furthermore, dimeric CMP-Ang1 induced angiogenesis and suppressed vascular leakage in vivo. Despite its dimeric structure, the potencies of such Tie2-activation-induced effects were comparable to those of a previously engineered protein, COMP-Ang1. We also revealed that these effects of dimeric CMP-Ang1 were affected by specified N-glycosylation in its fibrinogen-like domain. Taken together, our results indicate that dimeric CMP-Ang1 is capable of activating Tie2 and stimulating angiogenesis in N-glycan dependent manner. PMID:26478188

Updating and improving methodology for prioritizing highway project locations on the strategic intermodal system (SIS).

DOT National Transportation Integrated Search

2016-04-01

The Florida Department of Transportation (FDOT) District One developed the Congestion Management Process : (CMP) system to prioritize low-cost, near-term highway improvements on the Strategic Intermodal System (SIS). : The existing CMP system is desi...

Novel technique for fabrication of multi-layered microcoils in microelectromechanical systems (MEMS) applications

NASA Astrophysics Data System (ADS)

Chang, Hung-Pin; Qian, Jiangyuan; Bachman, Mark; Congdon, Philip; Li, Guann-pyng

2002-07-01

A novel planarization technique, compressive molding planarization (CMP) is developed for implementation of a multi-layered micro coil device. Applying CMP and other micromachining techniques, a multi-layered micro coil device has been designed and fabricated, and its use in the magnetic micro actuators for hard disk drive applications has been demonstrated, showing that it can produce milli-Newton of magnetic force suitable for driving a micro actuator. The novel CMP technique can be equally applicable in other MEMS devices fabrication to ease the process integration for the complicated structure.

Growth-promoting effects of pepsin- and trypsin-treated caseinomacropeptide from bovine milk on probiotics.

PubMed

Robitaille, Gilles; Champagne, Claude P

2014-08-01

Probiotic Lactobacillus and Bifidobacterium species are generally fastidious bacteria and require rich media for propagation. In milk-based media, they grow poorly, and nitrogen supplementation is required to produce high bacterial biomass levels. It has been reported that caseinomacropeptide (CMP), a 7-kDa peptide released from κ-casein during renneting or gastric digestion, exhibits some growth-promoting activity for lactobacilli and bifidobacteria. During the digestive process, peptides derived from CMP are detected in the intestinal lumen The aim of this study was to evaluate the effects of peptic and tryptic digests of CMP on probiotic lactic acid bacteria growth in de Man, Rogosa and Sharpe broth (MRS) and in milk during fermentation at 37 °C under anaerobic conditions. The study showed that pepsin-treated CMP used as supplements at 0.5 g/l can promote the growth of probiotics even in peptone-rich environments such as MRS. The effect was strain-dependent and evident for the strains that grow poorly in MRS, with an improvement of >1.5 times (P<0.05) by addition of pepsin-treated CMP. Trypsin-treated CMP was much less efficient as growth promoter. Moreover, pepsin-treated CMP was effective in promoting the growth in milk of all probiotic lactic acid bacteria tested, with biomass levels being improved significantly, by 1.7 to 2.6 times (P<0.05), depending on the strain. Thus, supplementation of MRS and of milk with pepsin-treated CMP would be advantageous for the production of high biomass levels for Bifidobacteria and Lactobacilli.

Interim Action Proposed Plan for the Chemicals, Metals, and Pesticides (CMP) Pits Operable Unit

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bradley, J.

2002-06-18

The purpose of this Interim Action Proposed Plan (IAPP) is to describe the preferred interim remedial action for addressing the Chemicals, Metals, and Pesticides (CMP) Pits Operable Unit and to provide an opportunity for public input into the remedial action selection process.

Comprehensive analysis of line-edge and line-width roughness for EUV lithography

NASA Astrophysics Data System (ADS)

Bonam, Ravi; Liu, Chi-Chun; Breton, Mary; Sieg, Stuart; Seshadri, Indira; Saulnier, Nicole; Shearer, Jeffrey; Muthinti, Raja; Patlolla, Raghuveer; Huang, Huai

2017-03-01

Pattern transfer fidelity is always a major challenge for any lithography process and needs continuous improvement. Lithographic processes in semiconductor industry are primarily driven by optical imaging on photosensitive polymeric material (resists). Quality of pattern transfer can be assessed by quantifying multiple parameters such as, feature size uniformity (CD), placement, roughness, sidewall angles etc. Roughness in features primarily corresponds to variation of line edge or line width and has gained considerable significance, particularly due to shrinking feature sizes and variations of features in the same order. This has caused downstream processes (Etch (RIE), Chemical Mechanical Polish (CMP) etc.) to reconsider respective tolerance levels. A very important aspect of this work is relevance of roughness metrology from pattern formation at resist to subsequent processes, particularly electrical validity. A major drawback of current LER/LWR metric (sigma) is its lack of relevance across multiple downstream processes which effects material selection at various unit processes. In this work we present a comprehensive assessment of Line Edge and Line Width Roughness at multiple lithographic transfer processes. To simulate effect of roughness a pattern was designed with periodic jogs on the edges of lines with varying amplitudes and frequencies. There are numerous methodologies proposed to analyze roughness and in this work we apply them to programmed roughness structures to assess each technique's sensitivity. This work also aims to identify a relevant methodology to quantify roughness with relevance across downstream processes.

A reliable control system for measurement on film thickness in copper chemical mechanical planarization system

NASA Astrophysics Data System (ADS)

Li, Hongkai; Qu, Zilian; Zhao, Qian; Tian, Fangxin; Zhao, Dewen; Meng, Yonggang; Lu, Xinchun

2013-12-01

In recent years, a variety of film thickness measurement techniques for copper chemical mechanical planarization (CMP) are subsequently proposed. In this paper, the eddy-current technique is used. In the control system of the CMP tool developed in the State Key Laboratory of Tribology, there are in situ module and off-line module for measurement subsystem. The in situ module can get the thickness of copper film on wafer surface in real time, and accurately judge when the CMP process should stop. This is called end-point detection. The off-line module is used for multi-points measurement after CMP process, in order to know the thickness of remained copper film. The whole control system is structured with two levels, and the physical connection between the upper and the lower is achieved by the industrial Ethernet. The process flow includes calibration and measurement, and there are different algorithms for two modules. In the process of software development, C++ is chosen as the programming language, in combination with Qt OpenSource to design two modules' GUI and OPC technology to implement the communication between the two levels. In addition, the drawing function is developed relying on Matlab, enriching the software functions of the off-line module. The result shows that the control system is running stably after repeated tests and practical operations for a long time.

A reliable control system for measurement on film thickness in copper chemical mechanical planarization system.

PubMed

Li, Hongkai; Qu, Zilian; Zhao, Qian; Tian, Fangxin; Zhao, Dewen; Meng, Yonggang; Lu, Xinchun

2013-12-01

In recent years, a variety of film thickness measurement techniques for copper chemical mechanical planarization (CMP) are subsequently proposed. In this paper, the eddy-current technique is used. In the control system of the CMP tool developed in the State Key Laboratory of Tribology, there are in situ module and off-line module for measurement subsystem. The in situ module can get the thickness of copper film on wafer surface in real time, and accurately judge when the CMP process should stop. This is called end-point detection. The off-line module is used for multi-points measurement after CMP process, in order to know the thickness of remained copper film. The whole control system is structured with two levels, and the physical connection between the upper and the lower is achieved by the industrial Ethernet. The process flow includes calibration and measurement, and there are different algorithms for two modules. In the process of software development, C++ is chosen as the programming language, in combination with Qt OpenSource to design two modules' GUI and OPC technology to implement the communication between the two levels. In addition, the drawing function is developed relying on Matlab, enriching the software functions of the off-line module. The result shows that the control system is running stably after repeated tests and practical operations for a long time.

A reliable control system for measurement on film thickness in copper chemical mechanical planarization system

DOE Office of Scientific and Technical Information (OSTI.GOV)

Li, Hongkai; Qu, Zilian; Zhao, Qian

In recent years, a variety of film thickness measurement techniques for copper chemical mechanical planarization (CMP) are subsequently proposed. In this paper, the eddy-current technique is used. In the control system of the CMP tool developed in the State Key Laboratory of Tribology, there are in situ module and off-line module for measurement subsystem. The in situ module can get the thickness of copper film on wafer surface in real time, and accurately judge when the CMP process should stop. This is called end-point detection. The off-line module is used for multi-points measurement after CMP process, in order to knowmore » the thickness of remained copper film. The whole control system is structured with two levels, and the physical connection between the upper and the lower is achieved by the industrial Ethernet. The process flow includes calibration and measurement, and there are different algorithms for two modules. In the process of software development, C++ is chosen as the programming language, in combination with Qt OpenSource to design two modules’ GUI and OPC technology to implement the communication between the two levels. In addition, the drawing function is developed relying on Matlab, enriching the software functions of the off-line module. The result shows that the control system is running stably after repeated tests and practical operations for a long time.« less

Fabrication of pseudo-spin-MOSFETs using a multi-project wafer CMOS chip

NASA Astrophysics Data System (ADS)

Nakane, R.; Shuto, Y.; Sukegawa, H.; Wen, Z. C.; Yamamoto, S.; Mitani, S.; Tanaka, M.; Inomata, K.; Sugahara, S.

2014-12-01

We demonstrate monolithic integration of pseudo-spin-MOSFETs (PS-MOSFETs) using vendor-made MOSFETs fabricated in a low-cost multi-project wafer (MPW) product and lab-made magnetic tunnel junctions (MTJs) formed on the topmost passivation film of the MPW chip. The tunneling magnetoresistance (TMR) ratio of the fabricated MTJs strongly depends on the surface roughness of the passivation film. Nevertheless, after the chip surface was atomically flattened by SiO2 deposition on it and successive chemical-mechanical polish (CMP) process for the surface, the fabricated MTJs on the chip exhibits a sufficiently large TMR ratio (>140%) adaptable to the PS-MOSFET application. The implemented PS-MOSFETs show clear modulation of the output current controlled by the magnetization configuration of the MTJs, and a maximum magnetocurrent ratio of 90% is achieved. These magnetocurrent behaviour is quantitatively consistent with those predicted by HSPICE simulations. The developed integration technique using a MPW CMOS chip would also be applied to monolithic integration of CMOS devices/circuits and other various functional devices/materials, which would open the door for exploring CMOS-based new functional hybrid circuits.

TRMM Common Microphysics Products: A Tool for Evaluating Spaceborne Precipitation Retrieval Algorithms

NASA Technical Reports Server (NTRS)

Kingsmill, David E.; Yuter, Sandra E.; Hobbs, Peter V.; Rangno, Arthur L.; Heymsfield, Andrew J.; Stith, Jeffrey L.; Bansemer, Aaron; Haggerty, Julie A.; Korolev, Alexei V.

2004-01-01

A customized product for analysis of microphysics data collected from aircraft during field campaigns in support of the TRMM program is described. These Common Microphysics Products (CMP's) are designed to aid in evaluation of TRMM spaceborne precipitation retrieval algorithms. Information needed for this purpose (e.g., particle size spectra and habit, liquid and ice water content) was derived using a common processing strategy on the wide variety of microphysical instruments and raw native data formats employed in the field campaigns. The CMP's are organized into an ASCII structure to allow easy access to the data for those less familiar with and without the tools to accomplish microphysical data processing. Detailed examples of the CMP show its potential and some of its limitations. This approach may be a first step toward developing a generalized microphysics format and an associated community-oriented, non-proprietary software package for microphysics data processing, initiatives that would likely broaden community access to and use of microphysics datasets.

Self-assembled nanocomplexes of anionic pullulan and polyallylamine for DNA and pH-sensitive intracellular drug delivery

NASA Astrophysics Data System (ADS)

Vora, Lalit; Tyagi, Monica; Patel, Ketan; Gupta, Sanjay; Vavia, Pradeep

2014-12-01

The amalgamation of chemotherapy and gene therapy is promising treatment option for cancer. In this study, novel biocompatible self-assembled nanocomplexes (NCs) between carboxylmethylated pullulan t335 (CMP) with polyallylamine (CMP-PAA NCs) were developed for plasmid DNA (pDNA) and pH-sensitive doxorubicin (DOX) delivery. DOX was conjugated to CMP (DOX-CMP) via hydrazone and confirmed by FTIR and 1H-NMR. In vitro release studies of pH-sensitive DOX-CMP conjugate showed 23 and 85 % release after 48 h at pH 7.4 (physiological pH) and pH 5 (intracellular/tumoral pH), respectively. The CMP-PAA NCs or DOX-CMP-PAA NCs self-assembled into a nanosized (<250 nm) spherical shape as confirmed by DLS and TEM. The hemolysis and cytotoxicity study indicated that the CMP-PAA NCs did not show cytotoxicity in comparison with plain polyallylamine. Gel retardation assay showed complete binding of pDNA with CMP-PAA NCs at 1:2 weight ratio. CMP-PAA NCs/pDNA showed significantly higher transfection in HEK293 cells compared to PAA/pDNA complexes. Confocal imaging demonstrated successful cellular uptake of DOX-CMP-PAA NCs in HEK293 cells. Thus, NCs hold great potential for targeted pDNA and pH-sensitive intratumoral drug delivery.

Cell-derived microparticles and vascular pregnancy complications: a systematic and comprehensive review.

PubMed

Alijotas-Reig, Jaume; Palacio-Garcia, Carles; Llurba, Elisa; Vilardell-Tarres, Miquel

2013-02-01

To assess current studies on the relationship between cell-derived microparticles (cMP) and recurrent miscarriages (RM) and pre-eclampsia (PE), and review the relationships between cMP and inflammatory and clot pathways, antiphospholipid antibodies (aPL), cytokines, and pregnancy complications. Systematic and comprehensive review of the literature from January 2000 to January 2012. Vall d'Hebron University Hospital. Women with recurrent miscarriages or PE, healthy nonpregnant women, and healthy pregnant women. None. Comparison of cMP numbers and types among groups. Platelet and endothelial cMP are increased in women with normal pregnancies compared with nonpregnant healthy women. Only five case-control studies regarding cMP and RM and 16 on cMP and PE were found to match our objective. Three of five articles referring to RM showed differences in cMP numbering, and 13 of 16 on cMP and PE showed differences in some type of cMP compared with controls. Cell-derived microparticles were raised in normal pregnancy. Recurrent miscarriage seems to be related to endothelial and platelet cell activation and/or consumption. An increase in almost all cMP types was observed in PE. A relationship between cMP and endothelial activation and proinflammatory status seems to exist. Copyright © 2013 American Society for Reproductive Medicine. Published by Elsevier Inc. All rights reserved.

Implications of the Differential Toxicological Effects of III-V Ionic and Particulate Materials for Hazard Assessment of Semiconductor Slurries.

PubMed

Jiang, Wen; Lin, Sijie; Chang, Chong Hyun; Ji, Zhaoxia; Sun, Bingbing; Wang, Xiang; Li, Ruibin; Pon, Nanetta; Xia, Tian; Nel, André E

2015-12-22

Because of tunable band gaps, high carrier mobility, and low-energy consumption rates, III-V materials are attractive for use in semiconductor wafers. However, these wafers require chemical mechanical planarization (CMP) for polishing, which leads to the generation of large quantities of hazardous waste including particulate and ionic III-V debris. Although the toxic effects of micron-sized III-V materials have been studied in vivo, no comprehensive assessment has been undertaken to elucidate the hazardous effects of submicron particulates and released III-V ionic components. Since III-V materials may contribute disproportionately to the hazard of CMP slurries, we obtained GaP, InP, GaAs, and InAs as micron- (0.2-3 μm) and nanoscale (<100 nm) particles for comparative studies of their cytotoxic potential in macrophage (THP-1) and lung epithelial (BEAS-2B) cell lines. We found that nanosized III-V arsenides, including GaAs and InAs, could induce significantly more cytotoxicity over a 24-72 h observation period. In contrast, GaP and InP particulates of all sizes as well as ionic GaCl3 and InCl3 were substantially less hazardous. The principal mechanism of III-V arsenide nanoparticle toxicity is dissolution and shedding of toxic As(III) and, to a lesser extent, As(V) ions. GaAs dissolves in the cell culture medium as well as in acidifying intracellular compartments, while InAs dissolves (more slowly) inside cells. Chelation of released As by 2,3-dimercapto-1-propanesulfonic acid interfered in GaAs toxicity. Collectively, these results demonstrate that III-V arsenides, GaAs and InAs nanoparticles, contribute in a major way to the toxicity of III-V materials that could appear in slurries. This finding is of importance for considering how to deal with the hazard potential of CMP slurries.

Preparation of chitosan/MCM-41-PAA nanocomposites and the adsorption behaviour of Hg(II) ions

NASA Astrophysics Data System (ADS)

Fu, Yong; Huang, Yue; Hu, Jianshe

2018-03-01

A novel functional hybrid mesoporous composite material (CMP) based on chitosan and MCM-41-PAA was reported and its application as an excellent adsorbent for Hg(II) ions was also investigated. Innovatively, MCM-41-PAA was prepared by using diatomite and polyacrylic acid (PAA) with integrated polymer-silica hybrid frameworks, and then CMP was fabricated by introducing MCM-41-PAA to chitosan using glutaraldehyde as a cross-linking agent. The structure and morphology of CMP were characterized by X-ray diffraction, Fourier transform infrared spectra, thermogravimetric analysis, scanning electron microscopy and Brunauer-Emmett-Teller measurements. The results showed that the CMP possessed multifunctional groups such as -OH, -COOH and -NH2 with large specific surface area. Adsorption behaviour of Hg(II) ions onto CMP was fitted better by the pseudo-second-order kinetic model and the Langmuir model when the initial Hg(II) concentration, pH, adsorption temperature and time were 200 mg l-1, 4, 298 K and 120 min, respectively, as the optimum conditions. The corresponding maximum adsorption capacity could reach 164 mg g-1. According to the thermodynamic parameters determined such as free energy, enthalpy and entropy, the adsorption process of Hg(II) ions was spontaneous endothermic adsorption.

Preparation of chitosan/MCM-41-PAA nanocomposites and the adsorption behaviour of Hg(II) ions

PubMed Central

Fu, Yong; Huang, Yue; Hu, Jianshe

2018-01-01

A novel functional hybrid mesoporous composite material (CMP) based on chitosan and MCM-41-PAA was reported and its application as an excellent adsorbent for Hg(II) ions was also investigated. Innovatively, MCM-41-PAA was prepared by using diatomite and polyacrylic acid (PAA) with integrated polymer–silica hybrid frameworks, and then CMP was fabricated by introducing MCM-41-PAA to chitosan using glutaraldehyde as a cross-linking agent. The structure and morphology of CMP were characterized by X-ray diffraction, Fourier transform infrared spectra, thermogravimetric analysis, scanning electron microscopy and Brunauer–Emmett–Teller measurements. The results showed that the CMP possessed multifunctional groups such as –OH, –COOH and –NH2 with large specific surface area. Adsorption behaviour of Hg(II) ions onto CMP was fitted better by the pseudo-second-order kinetic model and the Langmuir model when the initial Hg(II) concentration, pH, adsorption temperature and time were 200 mg l−1, 4, 298 K and 120 min, respectively, as the optimum conditions. The corresponding maximum adsorption capacity could reach 164 mg g−1. According to the thermodynamic parameters determined such as free energy, enthalpy and entropy, the adsorption process of Hg(II) ions was spontaneous endothermic adsorption. PMID:29657793

Design and Characterization of Next-Generation Micromirrors Fabricated in a Four-Level, Planarized Surface-Micromachined Polycrystalline Silicon Process

DOE Office of Scientific and Technical Information (OSTI.GOV)

Michalicek, M.A.; Comtois, J.H.; Barron, C.C.

This paper describes the design and characterization of several types of micromirror devices to include process capabilities, device modeling, and test data resulting in deflection versus applied potential curves. These micromirror devices are the first to be fabricated in the state-of-the-art four-level planarized polysilicon process available at Sandia National Laboratories known as the Sandia Ultra-planar Multi-level MEMS Technology (SUMMiT). This enabling process permits the development of micromirror devices with near-ideal characteristics which have previously been unrealizable in standard three-layer polysilicon processes. This paper describes such characteristics as elevated address electrodes, individual address wiring beneath the device, planarized mirror surfaces usingmore » Chemical Mechanical Polishing (CMP), unique post-process metallization, and the best active surface area to date. This paper presents the design, fabrication, modeling, and characterization of several variations of Flexure-Beam (FBMD) and Axial-Rotation Micromirror Devices (ARMD). The released devices are first metallized using a standard sputtering technique relying on metallization guards and masks that are fabricated next to the devices. Such guards are shown to enable the sharing of bond pads between numerous arrays of micromirrors in order to maximize the number of on-chip test arrays. The devices are modeled and then empirically characterized using a laser interferometer setup located at the Air Force Institute of Technology (AFIT) at Wright-Patterson AFB in Dayton, Ohio. Unique design considerations for these devices and the process are also discussed.« less

Condensed Matter Physics at ONR - A Nanoelectronics Perspective

NASA Astrophysics Data System (ADS)

Baatar, Chagaan

As a mission agency within the Department of Defense, the Office of Naval Research (ONR) currently does not have a program exclusively dedicated to condensed matter physics (CMP) research. Yet many CMP related topics are being funded under various programs scattered throughout the agency. In this talk I will provide an example of such a program - the ONR Nanoelectronics program, that I currently manage, and highlight some of the CMP related activities within the program. I may also mention a few topics that are funded by other ONR program officers. Finally, in addressing the theme of the session, I will describe the ONR Young Investigator Program (YIP) - its brief history, solicitation and evaluation processes involved, and provide a few examples from recent YIP projects.

Comorbidity of fibromyalgia and cervical myofascial pain syndrome.

PubMed

Cakit, Burcu Duyur; Taskin, Suhan; Nacir, Baris; Unlu, Irem; Genc, Hakan; Erdem, Hatice Rana

2010-04-01

The aims of this study are to determine the frequency of fibromyalgia syndrome (FMS) in patients with chronic cervical myofascial pain (CMP) and to investigate the FMS characteristics in CMP patients. Ninty-three patients with CMP and 30 age-matched healthy women were included in this study. Main outcome measures included visual analog scale (VAS), Beck Depression Inventory (BDI), and pain pressure thresholds. CMP patients were evaluated for the existence of FMS. The severity of FMS was assessed with total myalgic score (TMS) and control point score (CPS). Most common clinical characteristics of FMS were noted. Of the 93 CMP subjects, 22 (23.6%) patients fulfilled the classification criteria for FMS. Number of tender points were higher (p=0.0), while TMS (p=0.0) and CPS (p=0.0) values were lower in comorbid CMP and FMS patients than regional CMP group. There were statistically significant differences between regional CMP patients and comorbid CMP and FMS patients regarding presence of fatigue (p=0.0) and irritable bowel syndrome (p=0.022). There was no statistically significant difference between patient groups regarding VAS values (p>0.05). BDI values of the regional CMP were significantly lower than comorbid CMP and FMS patients (p=0.011). In conclusion, we found that nearly a quarter of CMP patients were comorbid with FMS, and psychological and comorbid symptoms were more prominent in comorbid patients. We thought that, these two syndromes might be overlapping conditions and as a peripheral pain generator or inducer of central sensitisation, MPS might lead to FMS or precipitate and worsen the FMS symptoms.

Note: Evaluation of slurry particle size analyzers for chemical mechanical planarization process

DOE Office of Scientific and Technical Information (OSTI.GOV)

Jang, Sunjae; Kulkarni, Atul; Qin, Hongyi

In the chemical mechanical planarization (CMP) process, slurry particle size is important because large particles can cause defects. Hence, selection of an appropriate particle measuring system is necessary in the CMP process. In this study, a scanning mobility particle sizer (SMPS) and dynamic light scattering (DLS) were compared for particle size distribution (PSD) measurements. In addition, the actual particle size and shape were confirmed by transmission electron microscope (TEM) results. SMPS classifies the particle size according to the electrical mobility, and measures the particle concentration (single particle measurement). On the other hand, the DLS measures the particle size distribution bymore » analyzing scattered light from multiple particles (multiple particle measurement). For the slurry particles selected for evaluation, it is observed that SMPS shows bi-modal particle sizes 30 nm and 80 nm, which closely matches with the TEM measurements, whereas DLS shows only single mode distribution in the range of 90 nm to 100 nm and showing incapability of measuring small particles. Hence, SMPS can be a better choice for the evaluation of CMP slurry particle size and concentration measurements.« less

Geometry-based across wafer process control in a dual damascene scenario

NASA Astrophysics Data System (ADS)

Krause, Gerd; Hofmann, Detlef; Habets, Boris; Buhl, Stefan; Gutsch, Manuela; Lopez-Gomez, Alberto; Thrun, Xaver

2018-03-01

Dual damascene is an established patterning process for back-end-of-line to generate copper interconnects and lines. One of the critical output parameters is the electrical resistance of the metal lines. In our 200 mm line, this is currently being controlled by a feed-forward control from the etch process to the final step in the CMP process. In this paper, we investigate the impact of alternative feed-forward control using a calibrated physical model that estimates the impact on electrical resistance of the metal lines* . This is done by simulation on a large set of wafers. Three different approaches are evaluated, one of which uses different feed-forward settings for different radial zones in the CMP process.

Decision Support Preferences Among Hispanic and Non-Hispanic White Older Adults With Chronic Musculoskeletal Pain.

PubMed

Riffin, Catherine; Pillemer, Karl; Reid, Manny C; Lӧckenhoff, Corinna E

2016-09-01

Despite broad recognition that social networks play a key role in the management of chronic musculoskeletal pain (CMP), little is known about when and why older adults with CMP choose to involve others in treatment decisions. This study investigates the types (i.e., informational, emotional, and instrumental) and sources (i.e., formal and informal) of support Hispanic and non-Hispanic White CMP patients desire and receive when making decisions about their pain care. Semi-structured interviews were conducted with Hispanic and non-Hispanic White older adults with CMP (N = 63) recruited from one medical center and one senior center in New York City. Interviews were transcribed and then analyzed using content analysis. CMP patients sought network members who supported their emotional well-being throughout the decision-making process. When considering high-stakes treatment decisions, participants selectively involved individuals who had similar pain conditions or first-hand experience with the procedure. Participants' perceptions of the decision-making process were contingent upon the congruence between the decision they made and the support they received for it. For Spanish-speaking participants, positive perceptions were linked with satisfactory language competence by their providers. On the other hand, lack of language competence among providers hindered Spanish speakers' ability to obtain adequate informational support. Results reveal the importance of empathic patient-provider exchanges across diverse patient populations and cultural sensitivity for Spanish-speaking patients. Findings suggest that social networks beyond the patient-provider dyad influence patients' decision-making satisfaction. © The Author 2015. Published by Oxford University Press on behalf of The Gerontological Society of America. All rights reserved. For permissions, please e-mail: journals.permissions@oup.com.

Formation of gallium nitride templates and freestanding substrates by hydride vapor phase epitaxy for homoepitaxial growth of III-nitride devices

NASA Astrophysics Data System (ADS)

Williams, Adrian Daniel

Gallium nitride (GaN) is a direct wide band gap semiconductor currently under heavy development worldwide due to interest in its applications in ultra-violet optoelectronics, power electronics, devices operating in harsh environments (high temperature or corrorsive), etc. While a number of devices have been demonstrated with this material and its related alloys, the unavailability of GaN substrates is seen as one of the current major bottlenecks to both material quality and device performance. This dissertation is concerned with the synthesis of high quality GaN substrates by the hydride vapor phase epitaxy method (HVPE). In this work, the flow of growth precursors in a home-built HVPE reactor was modeled by the Navier-Stokes equation and solved by finite element analysis to promote uniformity of GaN on 2'' sapphire substrates. Kinetics of growth was studied and various regimes of growth were identified to establish a methodology for HVPE GaN growth, independent of reactor geometry. GaN templates as well as bulk substrates were fabricated in this work. Realization of freestanding GaN substrates was achieved through discovery of a natural stress-induced method of separating bulk GaN from sapphire via mechanical failure of a low-temperature GaN buffer layer. Such a process eliminates the need for pre- or post-processing of sapphire substrates, as is currently the standard. Stress in GaN-on-sapphire is discussed, with the dominant contributor identified as thermal stress due to thermal expansion coefficient mismatch between the two materials. This thermal stress is analyzed using Stoney's equation and conditions for crack-free growth of thick GaN substrates were identified. An etch-back process for planarizing GaN templates was also developed and successfully applied to rough GaN templates. The planarization of GaN has been mainly addressed by chemo-mechanical polishing (CMP) methods in the literature, with notable shortcomings including the inability to effectively planarize gallium-polar GaN, the preferred growth plane for devices. The process developed in this work bypasses the constraints of CMP, allowing for the planarization of all surfaces of GaN irrespective of crystal orientation. The GaN samples grown for this dissertation were studied by various techniques to characterize their structural, optical, and electrical properties.

Two-dimensional cross correlation analysis of protein unfolding: Portrayal of the thermal denaturation of CMP kinases in the absence and presence of substrates

NASA Astrophysics Data System (ADS)

Schultz, Christian P.; Bârzu, Octavian; Mantsch, Henry H.

2000-03-01

The functional role of CMP kinases is to regenerate mono-phosphate nucleotides in cells by transferring phosphate residues from tri-phosphorylated nucleotides to monophosphorylated nucleotides. These enzymes possess two binding sites and maintain a highly conserved secondary structure. They are essential for cell survival. Herein we compare the infrared spectra of two similar, but not identical enzymes, the CMP kinases from Escherichia coli and Bacillus subtilis. A two-dimensional cross correlation analysis of the infrared spectra reveals differences in the denaturation behavior of the two proteins. Different secondary structure elements show different time-delayed or advanced unfolding events in the two enzymes. When bound to the active sites, the two nucleotide-substrates CMP and ATP exert a stabilizing effect on the structure of both proteins. The changes observed upon thermal denaturation are different for the two enzymes. Model 2D correlations are used to simulate the different denaturation of the two enzymes. Thermal denaturation and aggregation can be distinguished as two processes separated in time.

Effects of fluorine contamination on spin-on dielectric thickness in semiconductor manufacturing

NASA Astrophysics Data System (ADS)

Kim, Hyoung-ryeun; Hong, Soonsang; Kim, Samyoung; Oh, Changyeol; Hwang, Sung Min

2018-03-01

In the recent semiconductor industry, as the device shrinks, spin-on dielectric (SOD) has been adopted as a widely used material because of its excellent gap-fill, efficient throughput on mass production. SOD film must be uniformly thin, homogeneous and free of particle defects because it has been perfectly perserved after chemical-mechanical polishing (CMP) and etching process. Spin coating is one of the most common techniques for applying SOD thin films to substrates. In spin coating process, the film thickness and uniformity are strong function of the solution viscosity, the final spin speed and the surface properties. Especially, airborne molecular contaminants (AMCs), such as HF, HCl and NH3, are known to change to surface wetting characteristics. In this work, we study the SOD film thickness as a function of fluorine contamination on the wafer surface. To examine the effects of airborne molecular contamination, the wafers are directly exposed to HF fume followed by SOD coating. It appears that the film thickness decreases by higher contact angle on the wafer surface due to fluorine contamination. The thickness of the SOD film decreased with increasing fluorine contamination on the wafer surface. It means that the wafer surface with more hydrophobic property generates less hydrogen bonding with the functional group of Si-NH in polysilazane(PSZ)-SOD film. Therefore, the wetting properties of silicon wafer surfaces can be degraded by inorganic contamination in SOD coating process.

Vascular delay of the latissimus dorsi muscle: an essential component of cardiomyoplasty.

PubMed

Carroll, S M; Carroll, C M; Stremel, R W; Heilman, S J; Tobin, G R; Barker, J H

1997-04-01

Cardiomyoplasty (CMP) uses the latissimus dorsi muscle (LDM) to assist the heart in cases of cardiac failure. Distal ischemia and necrosis of the LDM is a recognized complication of CMP that can reduce distal muscle function and the mechanical effectiveness of CMP. Canine (n = 9) LDMs were subjected to a 10-day period of vascular delay followed by a simulated CMP. Two weeks after simulated CMP (corresponding to the healing delay between CMP and the onset of LDM stimulation used in the clinical setting), LDM perfusion was measured in the distal, middle, and proximal segments of the muscle, and circumferential (distal and middle squeezing muscle function) and longitudinal (proximal pulling muscle function) force generation and fatigue rates were measured. The results were compared with the contralateral nondelayed simulated CMP. Muscle perfusion was significantly (p < 0.05) greater in the distal and middle segments of vascular-delayed LDMs. Circumferential muscle force generation and fatigue rates were significantly (p < 0.05) improved in the vascular-delayed LDMs. Vascular delay can significantly improve LDM perfusion and function in a model that closely reflects clinical CMP, and the use of vascular delay may improve clinical outcomes in CMP.

42 CFR 417.407 - Requirements for a Competitive Medical Plan (CMP).

Code of Federal Regulations, 2010 CFR

2010-10-01

... 42 Public Health 3 2010-10-01 2010-10-01 false Requirements for a Competitive Medical Plan (CMP... AND HUMAN SERVICES (CONTINUED) MEDICARE PROGRAM HEALTH MAINTENANCE ORGANIZATIONS, COMPETITIVE MEDICAL... Requirements for a Competitive Medical Plan (CMP). (a) General rule. To qualify as a CMP, an entity must be...

42 CFR 417.407 - Requirements for a Competitive Medical Plan (CMP).

Code of Federal Regulations, 2011 CFR

2011-10-01

... 42 Public Health 3 2011-10-01 2011-10-01 false Requirements for a Competitive Medical Plan (CMP... AND HUMAN SERVICES (CONTINUED) MEDICARE PROGRAM HEALTH MAINTENANCE ORGANIZATIONS, COMPETITIVE MEDICAL... Requirements for a Competitive Medical Plan (CMP). (a) General rule. To qualify as a CMP, an entity must be...

ECM turnover-stimulated gene delivery through collagen-mimetic peptide-plasmid integration in collagen.

PubMed

Urello, Morgan A; Kiick, Kristi L; Sullivan, Millicent O

2017-10-15

Gene therapies have great potential in regenerative medicine; however, clinical translation has been inhibited by low stability and limited transfection efficiencies. Herein, we incorporate collagen-mimetic peptide (CMP)-linked polyplexes in collagen scaffolds to increase DNA stability by up to 400% and enable tailorable in vivo transgene expression at 100-fold higher levels and 10-fold longer time periods. These improvements were directly linked to a sustained interaction between collagen and polyplexes that persisted during cellular remodeling, polyplex uptake, and intracellular trafficking. Specifically, incorporation of CMPs into polyethylenimine (PEI) polyplexes preserved serum-exposed polyplex-collagen activity over a period of 14days, with 4 orders-of-magnitude more intact DNA present in CMP-modified polyplex-collagen relative to unmodified polyplex-collagen after a 10day incubation under cell culture conditions. CMP-modification also altered endocytic uptake, as indicated by gene silencing studies showing a nearly 50% decrease in transgene expression in response to caveolin-1 silencing in modified samples versus only 30% in unmodified samples. Furthermore, cellular internalization studies demonstrated that polyplex-collagen association persisted within cells in CMP polyplexes, but not in unmodified polyplexes, suggesting that CMP linkage to collagen regulates intracellular transport. Moreover, experiments in an in vivo repair model showed that CMP modification enabled tailoring of transgene expression from 4 to 25days over a range of concentrations. Overall, these findings demonstrate that CMP decoration provides substantial improvements in gene retention, altered release kinetics, improved serum-stability, and improved gene activity in vivo. This versatile technique has great potential for multiple applications in regenerative medicine. In this work, we demonstrate a novel approach for stably integrating DNA into collagen scaffolds to exploit the natural process of collagen remodelling for high efficiency non-viral gene delivery. The incorporation of CMPs into DNA polyplexes, coupled with the innate affinity between CMPs and collagen, not only permitted improved control over polyplex retention and release, but also provided a series of substantial and highly unique benefits via the stable and persistent linkage between CMP-polyplexes and collagen fragments. Specifically, CMP-modification of polyplexes was demonstrated to (i) control release for nearly a month, (ii) improve vector stability under physiological-like conditions, and (iii) provide ligands able to efficiently transfer genes via endocytic collagen pathways. These unique properties overcome key barriers inhibiting non-viral gene therapy. Copyright © 2017 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

A novel protein from edible fungi Cordyceps militaris that induces apoptosis.

PubMed

Bai, Ke-Chun; Sheu, Fuu

2018-01-01

Cordyceps militaris is a dietary therapeutic fungus that is an important model species in Cordyceps research. In this study, we purified a novel protein from the fruit bodies of C. militaris and designated it as Cordyceps militaris protein (CMP). CMP has a molecular mass of 18.0 kDa and is not glycosylated. Interestingly, CMP inhibited cell viability in murine primary cells and other cell lines in a time- and dose-dependent manner. Using trypan blue staining and a lactate dehydrogenase release assay, we showed that CMP caused cell death in the murine hepatoma cell line BNL 1MEA.7R.1. Furthermore, the frequency of BNL 1MEA.7R.1 cells at the sub-G1 stage was increased by CMP. Apoptosis, as determined by Annexin V and propidium iodide analysis, indicated that CMP could mediate BNL 1MEA.7R.1 apoptosis, but not necrosis. After coincubation with CMP, a decrease in mitochondria potential was detected using 3,3'-dihexyloxacarbocyanine iodide. These results suggest that CMP is a harmful protein that induces apoptosis through a mitochondrion-dependent pathway. Stability experiments demonstrated that heat treatment and alkalization degraded CMP and further destroyed its cell-death-inducing ability, implying that cooking is necessary for food containing C. militaris. Copyright © 2017. Published by Elsevier B.V.

Mechanism of inhibition of mammalian tumor and other thymidylate synthases by N sup 4 -hydroxy-dCMP, N sup 4 -hydroxy-5-fluoro-dCMP, and related analogues

DOE Office of Scientific and Technical Information (OSTI.GOV)

Rode, W.; Zielinski, Z.; Dzik, J.M.

1990-12-01

N{sup 4}-Hydroxy-dCMP (N{sup 4}-OH-dCMP), N{sup 4}-methoxy-dCMP (N{sup 4}-OMe-dCMP), and their 5-fluoro congeners were all slow-binding inhibitors of Ehrlich carcinoma thymidylate synthase (TS), competitive with respect to dUMP, and had differing kinetic constants describing interactions with the two TS binding sites. N{sup 4}-OH-dCMP was not a substrate and its inactivation of TS was methylenetetrahydrofolate-dependent, hence mechanism-based. K{sub i} values for N{sup 4}-OH-dCMP and its 5-fluoro analogue were in the range 10{sup {minus}7}-10{sup {minus}8} M, 2-3 orders of magnitude higher for the corresponding N{sup 4}-OMe analogues. The 5-methyl analogue of N{sup 4}-OHdCMP was 10{sup 4}-fold less potent, pointing to the anti rotamermore » of the imino form of exocyclic N{sup 4}-OH, relative to the ring N(3), as the active species. This is consistent with weaker slow-binding inhibition of the altered enzyme from 5-FdUrd-resistant, relative to parent, L1210 cells by both FdUMP and N{sup 4}-OH-dCMP, suggesting interaction of both N{sup 4}-OH and C(5)-F groups with the same region of the active center. Kinetic studies with purified enzyme from five sources, viz., Ehrlich carcinoma, L1210 parental, and 5-FdUrd-resistant cells, regenerating rat liver, and the tapeworm Hymenolepis diminuta, demonstrated that addition of a 5-fluoro substituent to N{sup 4}-OH-dCMP increased its affinity from 2- to 20-fold for the enzyme from different sources. With the Ehrlich and tapeworm enzymes, N{sup 4}-OH-FdCMP and FdUMP were almost equally effective inhibitors.« less

Effect of FA/O complexing agents and H2O2 on chemical mechanical polishing of ruthenium in weakly alkaline slurry

NASA Astrophysics Data System (ADS)

Bo, Duan; Weijing, An; Jianwei, Zhou; Shuai, Wang

2015-07-01

This paper investigated the effect of FA/O and hydrogen peroxide (H2O2) on ruthenium (Ru) removal rate (RR) and static etching rate (SER). It was revealed that Ru RR and SER first linearly increased then slowly decreaseed with the increasing H2O2 probably due to the formation of uniform Ru oxides on the surface during polishing. Their corrosion behaviors and states of surface oxidation were analyzed. In addition, FA/O could chelate Ru oxides (such as (RuO4)2- and RuO4- changed into soluble amine salts [R(NH3)4] (RuO4)2) and enhance Ru RR. The non-ionic surfactant AD was used to improve the Ru CMP performance. In particular, the addition of AD can lead to significant improvement of the surface roughness. Project supported by the Special Project Items No. 2 in National Long-Term Technology Development Plan (No. 2009ZX02308), the Natural Science Foundation of Hebei Province (No. E2013202247), the Science and Technology Plan Project of Hebei Province (Nos. Z2010112, 10213936), the Hebei Provincial Department of Education Fund (No. 2011128), and the Scientific Research Fund of Hebei Provincial Education (No. QN2014208).

Reversible Sialylation: Synthesis of CMP-NeuAc from 5′-CMP using α2,3-sialyl O-glycan, glycolipid and macromolecule based donors allow for the synthesis of diverse sialylated products

PubMed Central

Chandrasekaran, E.V.; Xue, Jun; Xia, Jie; Locke, Robert D.; Matta, Khushi L.; Neelamegham, Sriram

2008-01-01

Sialyltransferases transfer sialic acid from CMP-NeuAc to an acceptor molecule. Trans-sialidases of parasites transfer α2,3 linked sialic acid from one molecule to another without the involvement of CMP-NeuAc. Here, we report another type of sialylation termed reverse sialylation catalyzed by mammalian sialyltransferase ST3Gal-II. This enzyme synthesizes CMP-NeuAc by transferring NeuAc from the NeuAcα2,3Galβ1,3GalNAcα-unit of O-glycans, 3-sialyl globo unit of glycolipids and sialylated macromolecules to 5′-CMP. CMP-NeuAc produced in situ is utilized by the same enzyme to sialylate other O-glycans and by other sialyltransferases such as ST6Gal-I and ST6GalNAc-I forming α2,6 sialylated compounds. ST3Gal-II also catalyzed the conversion of 5′-UMP to UMP-NeuAc, which was found to be an inactive sialyl donor. Reverse sialylation proceeded without the need for free sialic acid, divalent metal ions or energy. The direct sialylation using CMP-NeuAc as well as the formation of CMP-NeuAc from 5′-CMP had a wide optimum range (pH 5.2–7.2 and 4.8–6.4 respectively) whereas the entire reaction comprising in situ production of CMP-NeuAc and sialylation of acceptor had a sharp optimum at pH 5.6 (the activity level 50% at pH 5.2 & 6.8 and 25% at pH 4.8 & 7.2). Several properties distinguish forward/conventional vs. reverse sialylation: i. Sodium citrate inhibited forward sialylation but not reverse sialylation. ii. 5′-CDP, a potent forward sialyltransferase inhibitor, did not inhibit the conversion of 5′-CMP to CMP-NeuAc. iii. The mucin core 2 compound 3-O-sulfoα2,3Galβ1,4GlcNAcβ1,6(Galβ1,3)GalNAcα-O-Bn, an efficient acceptor for ST3Gal-II, inhibited the conversion of 5′-CMP to CMP-NeuAc. A significant level of reverse sialylation activity is noted in human prostate cancer cell lines LNCaP and PC3. Overall, the study demonstrates that the sialyltransferase reaction is readily reversible in the case of ST3Gal-II and can be exploited for the enzymatic synthesis of diverse sialyl products. PMID:18067323

Large Cardiac Muscle Patches Engineered From Human Induced-Pluripotent Stem Cell-Derived Cardiac Cells Improve Recovery From Myocardial Infarction in Swine.

PubMed

Gao, Ling; Gregorich, Zachery R; Zhu, Wuqiang; Mattapally, Saidulu; Oduk, Yasin; Lou, Xi; Kannappan, Ramaswamy; Borovjagin, Anton V; Walcott, Gregory P; Pollard, Andrew E; Fast, Vladimir G; Hu, Xinyang; Lloyd, Steven G; Ge, Ying; Zhang, Jianyi

2018-04-17

Here, we generated human cardiac muscle patches (hCMPs) of clinically relevant dimensions (4 cm × 2 cm × 1.25 mm) by suspending cardiomyocytes, smooth muscle cells, and endothelial cells that had been differentiated from human induced-pluripotent stem cells in a fibrin scaffold and then culturing the construct on a dynamic (rocking) platform. In vitro assessments of hCMPs suggest maturation in response to dynamic culture stimulation. In vivo assessments were conducted in a porcine model of myocardial infarction (MI). Animal groups included: MI hearts treated with 2 hCMPs (MI+hCMP, n=13), MI hearts treated with 2 cell-free open fibrin patches (n=14), or MI hearts with neither experimental patch (n=15); a fourth group of animals underwent sham surgery (Sham, n=8). Cardiac function and infarct size were evaluated by MRI, arrhythmia incidence by implanted loop recorders, and the engraftment rate by calculation of quantitative polymerase chain reaction measurements of expression of the human Y chromosome. Additional studies examined the myocardial protein expression profile changes and potential mechanisms of action that related to exosomes from the cell patch. The hCMPs began to beat synchronously within 1 day of fabrication, and after 7 days of dynamic culture stimulation, in vitro assessments indicated the mechanisms related to the improvements in electronic mechanical coupling, calcium-handling, and force generation, suggesting a maturation process during the dynamic culture. The engraftment rate was 10.9±1.8% at 4 weeks after the transplantation. The hCMP transplantation was associated with significant improvements in left ventricular function, infarct size, myocardial wall stress, myocardial hypertrophy, and reduced apoptosis in the periscar boarder zone myocardium. hCMP transplantation also reversed some MI-associated changes in sarcomeric regulatory protein phosphorylation. The exosomes released from the hCMP appeared to have cytoprotective properties that improved cardiomyocyte survival. We have fabricated a clinically relevant size of hCMP with trilineage cardiac cells derived from human induced-pluripotent stem cells. The hCMP matures in vitro during 7 days of dynamic culture. Transplantation of this type of hCMP results in significantly reduced infarct size and improvements in cardiac function that are associated with reduction in left ventricular wall stress. The hCMP treatment is not associated with significant changes in arrhythmogenicity. © 2017 American Heart Association, Inc.

Signal processing and analysis for copper layer thickness measurement within a large variation range in the CMP process.

PubMed

Li, Hongkai; Zhao, Qian; Lu, Xinchun; Luo, Jianbin

2017-11-01

In the copper (Cu) chemical mechanical planarization (CMP) process, accurate determination of a process reaching the end point is of great importance. Based on the eddy current technology, the in situ thickness measurement of the Cu layer is feasible. Previous research studies focus on the application of the eddy current method to the metal layer thickness measurement or endpoint detection. In this paper, an in situ measurement system, which is independently developed by using the eddy current method, is applied to the actual Cu CMP process. A series of experiments are done for further analyzing the dynamic response characteristic of the output signal within different thickness variation ranges. In this study, the voltage difference of the output signal is used to represent the thickness of the Cu layer, and we can extract the voltage difference variations from the output signal fast by using the proposed data processing algorithm. The results show that the voltage difference decreases as thickness decreases in the conventional measurement range and the sensitivity increases at the same time. However, it is also found that there exists a thickness threshold, and the correlation is negative, when the thickness is more than the threshold. Furthermore, it is possible that the in situ measurement system can be used within a larger Cu layer thickness variation range by creating two calibration tables.

The Highly Robust Electrical Interconnects and Ultrasensitive Biosensors Based on Embedded Carbon Nanotube Arrays

NASA Technical Reports Server (NTRS)

Li, Jun; Cassell, Alan; Koehne, Jessica; Chen, Hua; Ng, Hou Tee; Ye, Qi; Stevens, Ramsey; Han, Jie; Meyyappan, M.

2003-01-01

We report on our recent breakthroughs in two different applications using well-aligned carbon nanotube (CNT) arrays on Si chips, including (1) a novel processing solution for highly robust electrical interconnects in integrated circuit manufacturing, and (2) the development of ultrasensitive electrochemical DNA sensors. Both of them rely on the invention of a bottom-up fabrication scheme which includes six steps, including: (a) lithographic patterning, (b) depositing bottom conducting contacts, (c) depositing metal catalysts, (d) CNT growth by plasma enhanced chemical vapor deposition (PECVD), (e) dielectric gap-filling, and (f) chemical mechanical polishing (CMP). Such processes produce a stable planarized surface with only the open end of CNTs exposed, whch can be further processed or modified for different applications. By depositing patterned top contacts, the CNT can serve as vertical interconnects between the two conducting layers. This method is fundamentally different fiom current damascene processes and avoids problems associated with etching and filling of high aspect ratio holes at nanoscales. In addition, multiwalled CNTs (MWCNTs) are highly robust and can carry a current density of 10(exp 9) A/square centimeters without degradation. It has great potential to help extending the current Si technology. The embedded MWCNT array without the top contact layer can be also used as a nanoelectrode array in electrochemical biosensors. The cell time-constant and sensitivity can be dramatically improved. By functionalizing the tube ends with specific oligonucleotide probes, specific DNA targets can be detected with electrochemical methods down to subattomoles.

Primary care physicians, acupuncture and chiropractic clinicians, and chronic pain patients: a qualitative analysis of communication and care coordination patterns.

PubMed

Penney, Lauren S; Ritenbaugh, Cheryl; Elder, Charles; Schneider, Jennifer; Deyo, Richard A; DeBar, Lynn L

2016-01-25

A variety of people, with multiple perspectives, make up the system comprising chronic musculoskeletal pain (CMP) treatment. While there are frequently problems in communication and coordination of care within conventional health systems, more opportunities for communicative disruptions seem possible when providers use different explanatory models and are not within the same health management system. We sought to describe the communication system surrounding the management of chronic pain from the perspectives of allopathic providers, acupuncture and chiropractor (A/C) providers, and CMP patients. We collected qualitative data from CMP patients (n = 90) and primary care physicians (PCPs) (n = 25) in a managed care system, and community acupuncture and chiropractic care providers (n = 14) who received high levels of referrals from the system, in the context of a longitudinal study of CMP patients' experience. Multiple points of divergence and communicative barriers were identified among the main stakeholders in the system. Those that were most frequently mentioned included issues surrounding the referral process (requesting, approving) and lack of consistent information flow back to providers that impairs overall management of patient care. We found that because of these problems, CMP patients were frequently tasked and sometimes overwhelmed with integrating and coordinating their own care, with little help from the system. Patients, PCPs, and A/C providers desire more communication; thus systems need to be created to facilitate more open communication which could positively benefit patient outcomes.

[Features of Clinical Register of Chinese Medicine and Pharmacy Based on ClinicalTrials.gov. (USA)].

PubMed

Lu, Peng-fei; Liao, Xing; Xie, Yan-ming; Wang, Zhi-guo

2015-11-01

In recent 10 years, clinical trials of Chinese medicine and pharmacy (cMP) at clinicalTrials.gov.(USA) are gradually increasing. In order to analyze features of CMP clinical register, ClinicalTrials.gov register database were comprehensively retrieved in this study. Included clinical trials were input one item after another using EXCEL. A final of 348 CMP clinical trials were included. Results showed that China occupied the first place in CMP clinical register, followed by USA. CMP clinical trials, sponsored mainly by colleges/universities and hospitals, mostly covered interventional studies on evaluating safety/effectiveness of CMP. The proportions of studies, sponsored by mainland China and companies, recruitment trials and multi-center clinical trials in interventional trials were increasing. The proportions of studies sponsored by Hong Kong and Taiwan, research completed trials, unclear research status, phase III clinical trials, and published research trials in interventional trials were decreasing. Published ratios of CMP clinical trials were quite low. There were more missing types and higher proportions in trial register information.

Musculoskeletal pain in patients with chronic kidney disease.

PubMed

Caravaca, Francisco; Gonzales, Boris; Bayo, Miguel Ángel; Luna, Enrique

2016-01-01

Chronic musculoskeletal pain (CMP) is a very common symptom in patients with chronic kidney disease (CKD), and is associated with a significant deterioration in quality of life. To determine the prevalence and clinical characteristics associated with CMP in patients with advanced CKD not on dialysis, and to analyse their relation with other uraemic symptoms and their prognosis significance. Cross-sectional study to analyse the uraemic symptoms of an unselected cohort of patients with CKD stage 4-5 pre-dialysis. In order to characterise patients with CMP, demographic and anthropometric data were collected, as well as data on comorbidities and kidney function. In addition, inflammatory parameters, uric parameters, bone mineral metabolism including 25-hydroxycholecalciferol (25-OHCC), creatine kinase and drugs of potential interest including allopurinol, statins and erythropoiesis-stimulating agents were recorded. The study group consisted of 1169 patients (mean age 65±15 years, 54% male). A total of 38% of patients complained of CMP, and this symptom was more prevalent in women than in men (49 vs. 28%; P<.0001). Muscle weakness, pruritus, muscle cramps, ecchymosis, insomnia, oedema and dyspnoea were the most common symptoms associated with CMP. There were no significant associations between serum levels of creatine kinase, 25-OHCC, treatment with allopurinol, statins or erythropoiesis-stimulating agents and CMP. The female gender, elderly age, obesity, comorbidity (mainly diabetes, heart failure or COPD), and elevated levels of inflammatory markers (C-reactive protein and non-neutrophilic leukocytes) were the best determinants of CMP. While patients with CMP showed a worse survival rate, a multivariate analysis adjusted for demographic data ruled out the independent association of CMP with mortality. CMP is highly prevalent in patients with advanced CKD and is associated with other common symptoms of chronic uraemia. As with the general population, elderly age, the female gender, obesity and some comorbid conditions are the best determinants of CMP. Increased inflammatory markers commonly observed in patients with CMP may have a relevant role in its pathogenesis. Copyright © 2016 Sociedad Española de Nefrología. Published by Elsevier España, S.L.U. All rights reserved.

IgG subclass reactivity to human cardiac myosin in cardiomyopathy patients is indicative of a Th1-like autoimmune disease

PubMed Central

Skyllouriotis, P; Skyllouriotis-Lazarou, M; Natter, S; Steiner, R; Spitzauer, S; Kapiotis, S; Valent, P; Hirschl, A M; Guber, S E; Laufer, G; Wollenek, G; Wolner, E; Wimmer, M; Valenta, R

1999-01-01

Studies performed in mice together with the demonstration of increased levels of heart-specific autoantibodies, cytokines and cytokine receptors in sera from cardiomyopathy (CMP) patients argued for a pathogenic role of autoimmune mechanisms in CMP. This study was designed to analyse the presence of IgG anti-heart antibodies in sera from patients suffering from hypertrophic and dilatative forms of CMP as well as from patients with ischaemic heart disease and healthy individuals. Patients' sera were analysed for IgG reactivity to Western-blotted extracts prepared from human epithelial and endothelial cells, heart and skeletal muscle specimens as well as from Streptococcus pyogenes. The IgG subclass (IgG1–4) reactivity to purified human cardiac myosin was analysed by ELISA. While sera from CMP patients and healthy individuals displayed comparable IgG reactivity to a variety of human proteins, cardiac myosin represented the prominent antigen detected strongly and preferentially by sera from CMP patients. Pronounced IgG anti-cardiac myosin reactivity was frequently found in sera from patients with dilatative CMP and reduced ventricular function. ELISA analyses revealed a prominent IgG2/IgG3 anti-cardiac myosin reactivity in CMP sera, indicating a preferential Th1-like immune response. Elevated anti-cytomegalovirus, anti-enterovirus IgG titres as well as IgG reactivity to nitrocellulose-blotted S. pyogenes proteins were also frequently observed in the group of CMP patients. If further work can support the hypothesis that autoreactivity to cardiac myosin represents a pathogenic factor in CMP, specific immunomodulation of this Th1- towards a Th2-like immune response may represent a promising therapeutic strategy for CMP. PMID:9933448

A conserved OmpA-like protein in Legionella pneumophila required for efficient intracellular replication.

PubMed

Goodwin, Ian P; Kumova, Ogan K; Ninio, Shira

2016-08-01

The OmpA-like protein domain has been associated with peptidoglycan-binding proteins, and is often found in virulence factors of bacterial pathogens. The intracellular pathogen Legionella pneumophila encodes for six proteins that contain the OmpA-like domain, among them the highly conserved uncharacterized protein we named CmpA. Here we set out to characterize the CmpA protein and determine its contribution to intracellular survival of L. pneumophila Secondary structure analysis suggests that CmpA is an inner membrane protein with a peptidoglycan-binding domain at the C-teminus. A cmpA mutant was able to replicate normally in broth, but failed to compete with an isogenic wild-type strain in an intracellular growth competition assay. The cmpA mutant also displayed significant intracellular growth defects in both the protozoan host Acanthamoeba castellanii and in primary bone marrow-derived macrophages, where uptake into the cells was also impaired. The cmpA phenotypes were completely restored upon expression of CmpA in trans The data presented here establish CmpA as a novel virulence factor of L. pneumophila that is required for efficient intracellular replication in both mammalian and protozoan hosts. © FEMS 2016. All rights reserved. For permissions, please e-mail: journals.permissions@oup.com.

Computer-Controlled Cylindrical Polishing Process for Development of Grazing Incidence Optics for Hard X-Ray Region

NASA Technical Reports Server (NTRS)

Khan, Gufran Sayeed; Gubarev, Mikhail; Speegle, Chet; Ramsey, Brian

2010-01-01

The presentation includes grazing incidence X-ray optics, motivation and challenges, mid spatial frequency generation in cylindrical polishing, design considerations for polishing lap, simulation studies and experimental results, future scope, and summary. Topics include current status of replication optics technology, cylindrical polishing process using large size polishing lap, non-conformance of polishin lap to the optics, development of software and polishing machine, deterministic prediction of polishing, polishing experiment under optimum conditions, and polishing experiment based on known error profile. Future plans include determination of non-uniformity in the polishing lap compliance, development of a polishing sequence based on a known error profile of the specimen, software for generating a mandrel polishing sequence, design an development of a flexible polishing lap, and computer controlled localized polishing process.

Cm-p5: an antifungal hydrophilic peptide derived from the coastal mollusk Cenchritis muricatus (Gastropoda: Littorinidae).

PubMed

López-Abarrategui, Carlos; McBeth, Christine; Mandal, Santi M; Sun, Zhenyu J; Heffron, Gregory; Alba-Menéndez, Annia; Migliolo, Ludovico; Reyes-Acosta, Osvaldo; García-Villarino, Mónica; Nolasco, Diego O; Falcão, Rosana; Cherobim, Mariana D; Dias, Simoni C; Brandt, Wolfgang; Wessjohann, Ludger; Starnbach, Michael; Franco, Octavio L; Otero-González, Anselmo J

2015-08-01

Antimicrobial peptides form part of the first line of defense against pathogens for many organisms. Current treatments for fungal infections are limited by drug toxicity and pathogen resistance. Cm-p5 (SRSELIVHQRLF), a peptide derived from the marine mollusk Cenchritis muricatus peptide Cm-p1, has a significantly increased fungistatic activity against pathogenic Candida albicans (minimal inhibitory concentration, 10 µg/ml; EC50, 1.146 µg/ml) while exhibiting low toxic effects against a cultured mammalian cell line. Cm-p5 as characterized by circular dichroism and nuclear magnetic resonance revealed an α-helical structure in membrane-mimetic conditions and a tendency to random coil folding in aqueous solutions. Additional studies modeling Cm-p5 binding to a phosphatidylserine bilayer in silico and isothermal titration calorimetry using lipid monophases demonstrated that Cm-p5 has a high affinity for the phospholipids of fungal membranes (phosphatidylserine and phosphatidylethanolamine), only moderate interactions with a mammalian membrane phospholipid, low interaction with ergosterol, and no interaction with chitin. Adhesion of Cm-p5 to living C. albicans cells was confirmed by fluorescence microscopy with FITC-labeled peptide. In a systemic candidiasis model in mice, intraperitoneal administration of Cm-p5 was unable to control the fungal kidney burden, although its low amphiphaticity could be modified to generate new derivatives with improved fungicidal activity and stability. © FASEB.

Synergistic effect of casein glycomacropeptide on sodium caseinate foaming properties.

PubMed

Morales, R; Martinez, M J; Pilosof, A M R

2017-11-01

Several strategies to improve the interfacial properties and foaming properties of proteins may be developed; among them, the use of mixtures of biopolymers that exhibit synergistic interactions. The aim of the present work was to evaluate the effect of casein glycomacropeptide (CMP) on foaming and surface properties of sodium caseinate (NaCas) and to establish the role of protein interactions in the aqueous phase. To this end particles size, interfacial and foaming properties of CMP, NaCas and NaCas-CMP mixtures at pH 5.5 and 7 were determined. At both pH, the interaction between CMP and NaCas induced a decrease in the aggregation state of NaCas. Single CMP foams showed the highest and NaCas the lowest foam overrun (FO) and the mixture exhibited intermediate values. CMP foam quickly drained. The drainage profile of mixed foams was closer to NaCas foams; at pH 5.5, mixed foams drained even slower than NaCas foam, exhibiting a synergistic performance. Additionally, a strong synergism was observed on the collapse of mixed foams at pH 5.5. Finally, a model to explain the synergistic effect observed on foaming properties in CMP-NaCas mixtures has been proposed; the reduced aggregation state of NaCas in the presence of CMP, made it more efficient for foam stabilization. Copyright © 2017 Elsevier B.V. All rights reserved.

Use of a novel radiometric method to assess the inhibitory effect of donepezil on acetylcholinesterase activity in minimally diluted tissue samples

PubMed Central

Kikuchi, Tatsuya; Okamura, Toshimitsu; Arai, Takuya; Obata, Takayuki; Fukushi, Kiyoshi; Irie, Toshiaki; Shiraishi, Tetsuya

2010-01-01

Background and purpose: Cholinesterase inhibitors have been widely used for the treatment of patients with dementia. Monitoring of the cholinesterase activity in the blood is used as an indicator of the effect of the cholinesterase inhibitors in the brain. The selective measurement of cholinesterase with low tissue dilution is preferred for accurate monitoring; however, the methods have not been established. Here, we investigated the effect of tissue dilution on the action of cholinesterase inhibitors using a novel radiometric method with selective substrates, N-[14C]methylpiperidin-4-yl acetate ([14C]MP4A) and (R)-N-[14C]methylpiperidin-3-yl butyrate ([14C]MP3B_R), for AChE and butyrylcholinesterase (BChE) respectively. Experimental approach: We investigated the kinetics of hydrolysis of [14C]-MP4A and [14C]-MP3B_R by cholinesterases, and evaluated the selectivity of [14C]MP4A and [14C]MP3B_R for human AChE and BChE, respectively, compared with traditional substrates. Then, IC50 values of cholinesterase inhibitors in minimally diluted and highly diluted tissues were measured with [14C]MP4A and [14C]MP3B_R. Key results: AChE and BChE activities were selectively measured as the first-order hydrolysis rates of [14C]-MP4A and [14C]MP3B_R respectively. The AChE selectivity of [14C]MP4A was an order of magnitude higher than traditional substrates used for the AChE assay. The IC50 values of specific AChE and BChE inhibitors, donepezil and ethopropazine, in 1.2-fold diluted human whole blood were much higher than those in 120-fold diluted blood. In addition, the IC50 values of donepezil in monkey brain were dramatically decreased as the tissue was diluted. Conclusions and implications: This method would effectively monitor the activity of cholinesterase inhibitors used for therapeutics, pesticides and chemical warfare agents. PMID:20401964

Health fair screening: the clinical utility of the comprehensive metabolic profile.

PubMed

Alpert, Jeffrey P; Greiner, Allen; Hall, Sandra

2004-01-01

Health fairs are a common method used by providers and health care organizations to provide screening tests, including comprehensive metabolic profiles (CMPs), to asymptomatic individuals. No national organizations currently recommend the complete CMP as a screening test for asymptomatic individuals in primary care settings. This study evaluated the value of CMPs in a health fair setting by measuring the ability of a health fair CMP to predict new medical diagnoses among residents of a sparsely populated rural county. Volunteer participants submitted fasting blood samples at a health fair conducted by a county health center in a county with 2,531 total residents. CMP values were determined to be "normal" or "abnormal" based on laboratory reference ranges and clinical judgment of the health center physicians. Medical records were reviewed 4 months later to determine if participants with abnormal CMP values had been diagnosed with new medical conditions as a result of the screening tests. Analysis was conducted to evaluate CMP test characteristics and determine whether demographic factors or specific CMP values predicted new medical diagnoses in the participants. Out of 478 health fair participants, 73 individuals had at least one abnormal CMP value. The most frequently occurring abnormal value was an elevated glucose level, with Hispanic participants significantly more likely to have this abnormality than whites. After all evaluation was completed, only about 1% of tested subjects had a new diagnosis as a result of the screening CMP test; most abnormal CMP tests did not result in a new diagnosis. The positive predictive value for an abnormal test resulting in a new medical diagnosis was 0.356. Comprehensive metabolic profiles have limited value as a screening tool in asymptomatic populations at health fairs.

[Anti-tissue transglutaminase antibodies not related to gluten intake].

PubMed

Garcia-Peris, Mónica; Donat Aliaga, Ester; Roca Llorens, María; Masip Simó, Etna; Polo Miquel, Begoña; Ribes Koninckx, Carmen

2018-03-16

Anti-tissue transglutaminase antibodies (tTG) have high specificity for coeliac disease (CD). However, positive anti-tTG antibodies have been described in non-coeliac patients. Aim To assess positive anti-tTG antibodies not related to gluten intake. Retrospective review and follow up conducted on patients with suspected CD (increase anti-tTG levels and gastrointestinal symptoms) but with atypical serology results, positive anti-tTG with gluten free diet and a decrease in anti-tTG levels despite gluten intake. A total of 9 cases were reviewed in which 5 cases had Marsh 3 involvement in the initial biopsy, and were diagnosed with CD (Group A). They began a gluten free diet and also a cow's milk protein (CMP) free diet because of their nutritional status. When CMP was re-introduced, anti-tTG increased, and returned to normal after the CMP was withdrawn again. The other 4 patients had a normal initial biopsy (Group B). Gluten was not removed from their diet, but they started a CMP free diet because a non IgE mediated CMP allergy was suspected. Symptoms disappeared, and anti-tTG was normal after CMP free diet with gluten intake. All the patients had susceptibility haplotype HLA DQ2/DQ8. CMP ingestion after an exclusion diet can induce an increase in anti-tTG in some coeliac subjects. CMP can produce this immune response if there were no gluten transgressions. This response has also been observed in non-IgE mediated CMP allergy patients with the susceptibility haplotype HLA DQ2/DQ8. Copyright © 2018. Publicado por Elsevier España, S.L.U.

The cox-maze procedure for lone atrial fibrillation: a single-center experience over 2 decades.

PubMed

Weimar, Timo; Schena, Stefano; Bailey, Marci S; Maniar, Hersh S; Schuessler, Richard B; Cox, James L; Damiano, Ralph J

2012-02-01

The Cox-Maze procedure (CMP) has achieved high success rates in the therapy of atrial fibrillation (AF) while becoming progressively less invasive. This report evaluates our experience with the CMP in the treatment of lone AF over 2 decades and compares the original cut-and-sew CMP-III to the ablation-assisted CMP-IV, which uses bipolar radiofrequency and cryoenergy to create the original lesion pattern. Data were collected prospectively on 212 consecutive patients (mean age, 53.5±10.4 years; 78% male) who underwent a stand-alone CMP from 1992 through 2010. The median duration of preoperative AF was 6 (interquartile range, 2.9-11.5) years, with 48% paroxysmal and 52% persistent or long-standing persistent AF. Univariate analysis with preoperative and perioperative variables used as covariates for the CMP-III (n=112) and the CMP-IV (n=100) was performed. Overall, 30-day mortality was 1.4%, with no intraoperative deaths. Freedom from AF was 93%, and freedom from AF off antiarrhythmics was 82%, at a mean follow-up time of 3.6±3.1 years. Freedom from symptomatic AF at 10 years was 85%. Only 1 late stroke occurred, with 80% of patients not receiving anticoagulation therapy. The less invasive CMP-IV had significantly shorter cross-clamp times (41±13 versus 92±26 minutes; P<0.001) while achieving high success rates, with 90% freedom from AF and 84% freedom from AF off antiarrhythmics at 2 years. The CMP, although simplified and shortened by alternative energy sources, has excellent results, even with improved follow-up and stricter definition of failure.

The Career Motivation Process Program

ERIC Educational Resources Information Center

Garrison, Clifford; And Others

1975-01-01

Describes the Career Motivation Process (CMP) program, an experimental approach to career counseling incorporating both the "personality" approach, which centers around personal self-examination, and the "decision-making" approach, which emphasizes the collection of information about possible career options. (JG)

United States Coast Guard Configuration Management Plan (CMP) for the Ports and Waterways Safety System (PAWSS) Project

DOT National Transportation Integrated Search

1997-01-01

Prepared ca. 1997. The Configuration Management Plan (CMP) provides configuration management instructions and guidance for the Vessel Traffic Service (VTS) system of the Ports and Waterways Safety System (PAWSS) project. The CMP describes in detail t...

The Structure of a Cyanobacterial Bicarbonate Transport Protein, CmpA

DOE Office of Scientific and Technical Information (OSTI.GOV)

Koropatkin, Nicole M.; Koppenaal, David W.; Pakrasi, Himadri B.

2007-01-26

Cyanobacteria, blue-green algae, are the most abundant autotrophs in aquatic environments and form the base of the food chain by fixing carbon and nitrogen into cellular biomass. To compensate for the low selectivity of Rubisco for CO₂ over O₂, Cyanobacteria have developed highly efficient CO₂concentrating machinery of which the ABC transport system CmpABCD from Synechocystis PCC 6803 is one component. Here we describe the structure of the bicarbonate binding protein, CmpA, in the absence and presence of bicarbonate and carbonic acid. CmpA is highly homologous to the nitrate transport protein, NrtA. CmpA binds carbonic acid at the entrance to themore » ligand-binding pocket whereas bicarbonate binds in nearly an identical location compared to nitrate binding to NrtA. Unexpectedly, bicarbonate binding is accompanied by a metal ion, identified as Ca²⁺ via inductively coupled plasma optical emission spectrometry. The binding of bicarbonate and metal is highly cooperative and suggests that CmpA co-transports bicarbonate and calcium.« less

[Improving the CMP appointment waiting time for children and adolescents].

PubMed

Cani, Pascale

2014-01-01

The increasing activity of mental health centres for children and adolescents and longer waiting times in obtaining a first appointment have led an area of child psychiatry to question the organisation of new consultation applications. Two CMP in the sector had a waiting period of over 40 days for half of the patients. Two improvement actions were implemented:the implementation of organisation and reception nurses and the development of a new applications management process. The evaluation after one year showed a decrease of half of the appointment waiting time without changing the non showed up rate.

Cystic meconium peritonitis with jejunoileal atresia: Is it associated with unfavorable outcome?

PubMed Central

Chan, Kin Wai Edwin; Lee, Kim Hung; Wong, Hei Yi Vicky; Tsui, Siu Yan Bess; Wong, Yuen Shan; Pang, Kit Yi Kristine; Mou, Jennifer Wai Cheung; Tam, Yuk Him

2017-01-01

AIM To compare the outcome between patients with jejunoileal atresia (JIA) associated with cystic meconium peritonitis (CMP) and patients with isolated JIA (JIA without CMP). METHODS A retrospective study was conducted for all neonates with JIA operated in our institute from January 2005 to January 2016. Demographics including the gestation age, sex, birth weight, age at operation, the presence of associated syndrome was recorded. Clinical outcome including the type of operation performed, operative time, the need for reoperation and mortality were studied. The demographics and the outcome between the 2 groups were compared. RESULTS During the study period, 53 neonates had JIA underwent operation in our institute. Seventeen neonates (32%) were associated with CMP. There was no statistical difference on the demographics in the two groups. Patients with CMP had earlier operation than patients with isolated JIA (mean 1.4 d vs 3 d, P = 0.038). Primary anastomosis was performed in 16 patients (94%) with CMP and 30 patients (83%) with isolated JIA (P = 0.269). Patients with CMP had longer operation (mean 190 min vs 154 min, P = 0.004). There were no statistical difference the need for reoperation (3 vs 6, P = 0.606) and mortality (2 vs 1, P = 0.269) between the two groups. CONCLUSION Primary intestinal anastomosis can be performed in 94% of patients with JIA associated with CMP. Although patients with CMP had longer operative time, the mortality and reoperation rates were low and were comparable to patients with isolated JIA. PMID:28224094

Circulating cell-derived microparticles in severe preeclampsia and in fetal growth restriction.

PubMed

Alijotas-Reig, Jaume; Palacio-Garcia, Carles; Farran-Codina, Immaculada; Ruiz-Romance, Mar; Llurba, Elisa; Vilardell-Tarres, Miquel

2012-02-01

The behavior of the circulating microparticles (cMP) in severe preeclampsia (PE) and fetal growth restriction (FGR) is disputed. METHOD OF STUDY  Non-matched case-control study. Seventy cases of severe PE/HELLP/FGR were compared to 38 healthy pregnant women. Twenty healthy non-pregnant women acted as a control. cMP were analyzed using flow cytometry. Results are given as total (annexin-A5-ANXA5+), platelet (CD41+), leukocyte (CD45+), endothelial (CD144+CD31+//CD41-), and CD41-negative cMP/μL of plasma. Antiphospholipid antibodies (aPL) were analyzed through usual methods. Platelet and endothelial cMP increased in healthy pregnant women. PE whole group (PE±FGR) showed an increase in endothelial and CD41-negative, but not in platelet-derived, cMP. Comparing PE whole group versus healthy pregnant, we found cMP levels of endothelial and CD41- had increased. The cMP results obtained in PE group were similar to those of the PE whole group. Comparing PE group to isolated FGR, significant CD41-negative cMP increase was found in PE. According to its aPL positivity, a trend to decrease in leukocyte and endothelial-derived cMP was found in PE group. Normal pregnancy is accompanied by endothelial and platelet cell activation. Endothelial cell activation has been shown in PE but not in isolated FGR. In PE, aPL may contribute to endothelial and possibly to leukocyte cell activation. © 2011 John Wiley & Sons A/S.

An occupational exposure assessment for engineered nanoparticles used in semiconductor fabrication.

PubMed

Shepard, Michele Noble; Brenner, Sara

2014-03-01

Engineered nanoparticles of alumina, amorphous silica, and ceria are used in semiconductor device fabrication during wafer polishing steps referred to as 'chemical mechanical planarization' (CMP). Some metal oxide nanoparticles can impact the biological response of cells and organ systems and may cause adverse health effects; additional research is necessary to better understand potential risks from nanomaterial applications and occupational exposure scenarios. This study was conducted to assess potential airborne exposures to nanoparticles and agglomerates using direct-reading instruments and filter-based samples to characterize workplace aerosols by particle number, mass, size, composition, and morphology. Sampling was repeated for tasks in three work areas (fab, subfab, wastewater treatment) at a facility using engineered nanoparticles for CMP. Real-time measurements were collected using a condensation particle counter (CPC), optical particle counter, and scanning mobility particle spectrometer (SMPS). Filter-based samples were analyzed for total mass or the respirable fraction, and for specific metals of interest. Additional air sample filters were analyzed by transmission electron microscopy with energy dispersive x-ray spectroscopy (TEM/EDX) for elemental identification and to provide data on particle size, morphology, and concentration. Peak concentrations measured on the CPC ranged from 1 to 16 particles per cubic centimeter (P cm(-3)) for background and from 4 to 74 P cm(-3) during tasks sampled in the fab; from 1 to 60 P cm(-3) for background and from 3 to 84 P cm(-3) for tasks sampled in the subfab; and from 1160 to 45 894 P cm(-3) for background and from 1710 to 45 519 P cm(-3) during wastewater treatment system filter change tasks. Significant variability was seen among the repeated task measurements and among background comparisons in each area. Several data analysis methods were used to compare each set of task and background measurements. Increased concentrations of respirable particles were identified for some tasks sampled in each work area, although of relatively low magnitude and inconsistently among repeated measurements for specific tasks. Measurements with a portable SMPS indicated that nanoparticle number concentrations (channels 11.5-115.5nm) increased above background levels by 3.2 P cm(-3) during CMP tool set-up in the fab area but were not elevated when changing filters for the CMP wastewater treatment system. All results from mass concentration analysis were below the limits of detection. Characterization by TEM/EDX identified structures containing the elements of interest (Al, Si), primarily as agglomerates or aggregates in the 100-1000nm size range. Although health-based occupational exposure limits have not been established for nanoscale alumina, silica, or ceria, the measured concentrations by number and mass were below currently proposed benchmarks or reference values for poorly soluble low-toxicity nanoparticles.

42 CFR 417.424 - Denial of enrollment.

Code of Federal Regulations, 2011 CFR

2011-10-01

... of § 417.422 if acceptance would— (1) Cause the number of enrollees who are Medicare or Medicaid... substantially nonrepresentative of the general population in the HMO's or CMP's geographic area. (b) Selection... the HMO or CMP substantially nonrepresentative of the general population in the HMO's or CMP's...

42 CFR 417.480 - Maintenance of records: Cost HMOs and CMPs.

Code of Federal Regulations, 2010 CFR

2010-10-01

... or CMP, and operation of the HMO's or CMP's financial, medical, and other recordkeeping systems. (2..., sale, or other action. (5) Agreements, contracts, and subcontracts. (6) Franchise, marketing, and management agreements. (7) Schedules of charges for the HMO's or CMP's fee-for-service patients. (8) Matters...

Exposure assessment and risk management of engineered nanoparticles: Investigation in semiconductor wafer processing

NASA Astrophysics Data System (ADS)

Shepard, Michele N.

Engineered nanomaterials (ENMs) are currently used in hundreds of commercial products and industrial processes, with more applications being investigated. Nanomaterials have unique properties that differ from bulk materials. While these properties may enable technological advancements, the potential risks of ENMs to people and the environment are not yet fully understood. Certain low solubility nanoparticles are more toxic than their bulk material, such that existing occupational exposure limits may not be sufficiently protective for workers. Risk assessments are currently challenging due to gaps in data on the numerous emerging materials and applications as well as method uncertainties and limitations. Chemical mechanical planarization (CMP) processes with engineered nanoparticle abrasives are used for research and commercial manufacturing applications in the semiconductor and related industries. Despite growing use, no published studies addressed occupational exposures to nanoparticles associated with CMP or risk assessment and management practices for these scenarios. Additional studies are needed to evaluate potential sources of workplace exposure or emission, as well as to help test and refine assessment methods. This research was conducted to: identify the lifecycle stages and potential exposure sources for ENMs in CMP processes; characterize worker exposure; determine recommended engineering controls and compare risk assessment models. The study included workplace air and surface sampling and an evaluation of qualitative risk banding approaches. Exposure assessment results indicated the potential for worker contact with ENMs on workplace surfaces but did not identify nanoparticles readily dispersed in air during work tasks. Some increases in respirable particle concentrations were identified, but not consistently. Measured aerosol concentrations by number and mass were well below current reference values for poorly soluble low toxicity nanoparticles. From application and evaluation of qualitative risk assessment approaches, differences in control banding models and results were identified, although output generally agreed with conclusions from air sampling as to whether an upgrade in site engineering controls was recommended. This research helped to improve understanding of potential worker exposures to ENMs in CMP processes, as well as the methods for risk assessment and management of metal oxide nanoparticles in occupational environments.

The study of optimization on process parameters of high-accuracy computerized numerical control polishing

NASA Astrophysics Data System (ADS)

Huang, Wei-Ren; Huang, Shih-Pu; Tsai, Tsung-Yueh; Lin, Yi-Jyun; Yu, Zong-Ru; Kuo, Ching-Hsiang; Hsu, Wei-Yao; Young, Hong-Tsu

2017-09-01

Spherical lenses lead to forming spherical aberration and reduced optical performance. Consequently, in practice optical system shall apply a combination of spherical lenses for aberration correction. Thus, the volume of the optical system increased. In modern optical systems, aspherical lenses have been widely used because of their high optical performance with less optical components. However, aspherical surfaces cannot be fabricated by traditional full aperture polishing process due to their varying curvature. Sub-aperture computer numerical control (CNC) polishing is adopted for aspherical surface fabrication in recent years. By using CNC polishing process, mid-spatial frequency (MSF) error is normally accompanied during this process. And the MSF surface texture of optics decreases the optical performance for high precision optical system, especially for short-wavelength applications. Based on a bonnet polishing CNC machine, this study focuses on the relationship between MSF surface texture and CNC polishing parameters, which include feed rate, head speed, track spacing and path direction. The power spectral density (PSD) analysis is used to judge the MSF level caused by those polishing parameters. The test results show that controlling the removal depth of single polishing path, through the feed rate, and without same direction polishing path for higher total removal depth can efficiently reduce the MSF error. To verify the optical polishing parameters, we divided a correction polishing process to several polishing runs with different direction polishing paths. Compare to one shot polishing run, multi-direction path polishing plan could produce better surface quality on the optics.

Research of polishing process to control the iron contamination on the magnetorheological finished KDP crystal surface.

PubMed

Chen, Shaoshan; Li, Shengyi; Peng, Xiaoqiang; Hu, Hao; Tie, Guipeng

2015-02-20

A new nonaqueous and abrasive-free magnetorheological finishing (MRF) method is adopted for processing a KDP crystal. MRF polishing is easy to result in the embedding of carbonyl iron (CI) powders; meanwhile, Fe contamination on the KDP crystal surface will affect the laser induced damage threshold seriously. This paper puts forward an appropriate MRF polishing process to avoid the embedding. Polishing results show that the embedding of CI powders can be avoided by controlling the polishing parameters. Furthermore, on the KDP crystal surface, magnetorheological fluids residua inevitably exist after polishing and in which the Fe contamination cannot be removed completely by initial ultrasonic cleaning. To solve this problem, a kind of ion beam figuring (IBF) polishing is introduced to remove the impurity layer. Then the content of Fe element contamination and the depth of impurity elements are measured by time of flight secondary ion mass spectrometry. The measurement results show that there are no CI powders embedding in the MRF polished surface and no Fe contamination after the IBF polishing process, respectively. That verifies the feasibility of MRF polishing-IBF polishing (cleaning) for processing a KDP crystal.

Impact of a human CMP-sialic acid transporter on recombinant glycoprotein sialylation in glycoengineered insect cells.

PubMed

Mabashi-Asazuma, Hideaki; Shi, Xianzong; Geisler, Christoph; Kuo, Chu-Wei; Khoo, Kay-Hooi; Jarvis, Donald L

2013-02-01

Insect cells are widely used for recombinant glycoprotein production, but they cannot provide the glycosylation patterns required for some biotechnological applications. This problem has been addressed by genetically engineering insect cells to express mammalian genes encoding various glycoprotein glycan processing functions. However, for various reasons, the impact of a mammalian cytosine-5'-monophospho (CMP)-sialic acid transporter has not yet been examined. Thus, we transformed Spodoptera frugiperda (Sf9) cells with six mammalian genes to generate a new cell line, SfSWT-4, that can produce sialylated glycoproteins when cultured with the sialic acid precursor, N-acetylmannosamine. We then super-transformed SfSWT-4 with a human CMP-sialic acid transporter (hCSAT) gene to isolate a daughter cell line, SfSWT-6, which expressed the hCSAT gene in addition to the other mammalian glycogenes. SfSWT-6 cells had higher levels of cell surface sialylation and also supported higher levels of recombinant glycoprotein sialylation, particularly when cultured with low concentrations of N-acetylmannosamine. Thus, hCSAT expression has an impact on glycoprotein sialylation, can reduce the cost of recombinant glycoprotein production and therefore should be included in ongoing efforts to glycoengineer the baculovirus-insect cell system. The results of this study also contributed new insights into the endogenous mechanism and potential mechanisms of CMP-sialic acid accumulation in the Golgi apparatus of lepidopteran insect cells.

The Major Soybean Allergen Gly m Bd 28K Induces Hypersensitivity Reactions in Mice Sensitized to Cow's Milk Proteins.

PubMed

Candreva, Ángela María; Smaldini, Paola Lorena; Curciarello, Renata; Fossati, Carlos Alberto; Docena, Guillermo Horacio; Petruccelli, Silvana

2016-02-24

Reactions to soy have been reported in a proportion of patients with IgE-mediated cow's milk allergy (CMA). In this work, we analyzed if Gly m Bd 28K/P28, one of the major soybean allergens, is a cross-reactive allergen with cow milk proteins (CMP). We showed that P28 was recognized by IgE sera from CMA patients and activated human peripheral basophils degranulation. Moreover, IgE sera of mice exclusively sensitized to CMP recognized P28. Splenocytes from sensitized animals secreted IL-5 and IL-13 when incubated with CMP or soy proteins, but only IL-13 when treated with P28. In addition, a skin test was strongly positive for CMP and weakly positive for P28. Remarkably, milk-sensitized mice showed hypersensitivity symptoms following sublingual challenge with P28 or CMP. With the use of bioinformatics' tools seven putative cross-reactive epitopes were identified. In conclusion, using in vitro and in vivo tests we demonstrated that P28 is a novel cross-reactive allergen with CMP.

SPOT4 Operational Control Center (CMP)

NASA Technical Reports Server (NTRS)

Zaouche, G.

1993-01-01

CNES(F) is responsible for the development of a new generation of Operational Control Center (CMP) which will operate the new heliosynchronous remote sensing satellite (SPOT4). This Operational Control Center takes large benefit from the experience of the first generation of control center and from the recent advances in computer technology and standards. The CMP is designed for operating two satellites all the same time with a reduced pool of controllers. The architecture of this CMP is simple, robust, and flexible, since it is based on powerful distributed workstations interconnected through an Ethernet LAN. The application software uses modern and formal software engineering methods, in order to improve quality and reliability, and facilitate maintenance. This software is table driven so it can be easily adapted to other operational needs. Operation tasks are automated to the maximum extent, so that it could be possible to operate the CMP automatically with very limited human interference for supervision and decision making. This paper provides an overview of the SPOTS mission and associated ground segment. It also details the CMP, its functions, and its software and hardware architecture.

Anaerobic biodegradability and methanogenic toxicity of key constituents in copper chemical mechanical planarization effluents of the semiconductor industry.

PubMed

Hollingsworth, Jeremy; Sierra-Alvarez, Reyes; Zhou, Michael; Ogden, Kimberly L; Field, Jim A

2005-06-01

Copper chemical mechanical planarization (CMP) effluents can account for 30-40% of the water discharge in semiconductor manufacturing. CMP effluents contain high concentrations of soluble copper and a complex mixture of organic constituents. The aim of this study is to perform a preliminary assessment of the treatability of CMP effluents in anaerobic sulfidogenic bioreactors inoculated with anaerobic granular sludge by testing individual compounds expected in the CMP effluents. Of all the compounds tested (copper (II), benzotriazoles, polyethylene glycol (M(n) 300), polyethylene glycol (M(n) 860) monooleate, perfluoro-1-octane sulfonate, citric acid, oxalic acid and isopropanol) only copper was found to be inhibitory to methanogenic activity at the concentrations tested. Most of the organic compounds tested were biodegradable with the exception of perfluoro-1-octane sulfonate and benzotriazoles under sulfate reducing conditions and with the exception of the same compounds as well as Triton X-100 under methanogenic conditions. The susceptibility of key components in CMP effluents to anaerobic biodegradation combined with their low microbial inhibition suggest that CMP effluents should be amenable to biological treatment in sulfate reducing bioreactors.

Incorporating travel-time reliability into the congestion management process : a primer.

DOT National Transportation Integrated Search

2015-02-01

This primer explains the value of incorporating travel-time reliability into the Congestion Management Process (CMP) : and identifies the most current tools available to assist with this effort. It draws from applied research and best practices : fro...

Cm-p5: an antifungal hydrophilic peptide derived from the coastal mollusk Cenchritis muricatus (Gastropoda: Littorinidae)

PubMed Central

López-Abarrategui, Carlos; McBeth, Christine; Mandal, Santi M.; Sun, Zhenyu J.; Heffron, Gregory; Alba-Menéndez, Annia; Migliolo, Ludovico; Reyes-Acosta, Osvaldo; García-Villarino, Mónica; Nolasco, Diego O.; Falcão, Rosana; Cherobim, Mariana D.; Dias, Simoni C.; Brandt, Wolfgang; Wessjohann, Ludger; Starnbach, Michael; Franco, Octavio L.; Otero-González, Anselmo J.

2015-01-01

Antimicrobial peptides form part of the first line of defense against pathogens for many organisms. Current treatments for fungal infections are limited by drug toxicity and pathogen resistance. Cm-p5 (SRSELIVHQRLF), a peptide derived from the marine mollusk Cenchritis muricatus peptide Cm-p1, has a significantly increased fungistatic activity against pathogenic Candida albicans (minimal inhibitory concentration, 10 µg/ml; EC50, 1.146 µg/ml) while exhibiting low toxic effects against a cultured mammalian cell line. Cm-p5 as characterized by circular dichroism and nuclear magnetic resonance revealed an α-helical structure in membrane-mimetic conditions and a tendency to random coil folding in aqueous solutions. Additional studies modeling Cm-p5 binding to a phosphatidylserine bilayer in silico and isothermal titration calorimetry using lipid monophases demonstrated that Cm-p5 has a high affinity for the phospholipids of fungal membranes (phosphatidylserine and phosphatidylethanolamine), only moderate interactions with a mammalian membrane phospholipid, low interaction with ergosterol, and no interaction with chitin. Adhesion of Cm-p5 to living C. albicans cells was confirmed by fluorescence microscopy with FITC-labeled peptide. In a systemic candidiasis model in mice, intraperitoneal administration of Cm-p5 was unable to control the fungal kidney burden, although its low amphiphaticity could be modified to generate new derivatives with improved fungicidal activity and stability.—López-Abarrategui, C., McBeth, C., Mandal, S. M., Sun, Z. J., Heffron, G., Alba-Menéndez, A., Migliolo, L., Reyes-Acosta, O., García-Villarino, M., Nolasco, D. O., Falcão, R., Cherobim, M. D., Dias, S. C., Brandt, W., Wessjohann, L., Starnbach, M., Franco, O. L., Otero-González, A. J. Cm-p5: an antifungal hydrophilic peptide derived from the coastal mollusk Cenchritis muricatus (Gastropoda: Littorinidae). PMID:25921828

Atomic insight into tribochemical wear mechanism of silicon at the Si/SiO2 interface in aqueous environment: Molecular dynamics simulations using ReaxFF reactive force field

NASA Astrophysics Data System (ADS)

Wen, Jialin; Ma, Tianbao; Zhang, Weiwei; Psofogiannakis, George; van Duin, Adri C. T.; Chen, Lei; Qian, Linmao; Hu, Yuanzhong; Lu, Xinchun

2016-12-01

In this work, the atomic mechanism of tribochemical wear of silicon at the Si/SiO2 interface in aqueous environment was investigated using ReaxFF molecular dynamics (MD) simulations. Two types of Si atom removal pathways were detected in the wear process. The first is caused by the destruction of stretched Si-O-Si bonds on the Si substrate surface and is assisted by the attachment of H atoms on the bridging oxygen atoms of the bonds. The other is caused by the rupture of Si-Si bonds in the stretched Si-Si-O-Si bond chains at the interface. Both pathways effectively remove Si atoms from the silicon surface via interfacial Si-O-Si bridge bonds. Our simulations also demonstrate that higher pressures applied to the silica phase can cause more Si atoms to be removed due to the formation of increased numbers of interfacial Si-O-Si bridge bonds. Besides, water plays a dual role in the wear mechanism, by oxidizing the Si substrate surface as well as by preventing the close contact of the surfaces. This work shows that the removal of Si atoms from the substrate is a result of both chemical reaction and mechanical effects and contributes to the understanding of tribochemical wear behavior in the microelectromechanical systems (MEMS) and Si chemical mechanical polishing (CMP) process.

42 CFR 417.584 - Payment to HMOs or CMPs with risk contracts.

Code of Federal Regulations, 2010 CFR

2010-10-01

... CMP. (a) Principle of payment. CMS makes monthly advance payments equivalent to the HMO's or CMP's per... subsequent monthly payments to take account of the difference. (d) Reduction of payments. If an HMO or CMP... 1998, HMOs or CMPs with risk contracts will be paid in accordance with principles contained in subpart...

42 CFR 417.576 - Final settlement.

Code of Federal Regulations, 2011 CFR

2011-10-01

... end of each contract period, unless CMS extends the period for good cause shown by the HMO or CMP. (2... by common ownership or control; and (B) For reports for cost-reporting periods that begin on or after... CMP or related to the HMO or CMP by common ownership or control and that provides services to the HMO...

Study of Profile Changes during Mechanical Polishing using Relocation Profilometry

NASA Astrophysics Data System (ADS)

Kumaran, S. Chidambara; Shunmugam, M. S.

2017-10-01

Mechanical polishing is a finishing process practiced conventionally to enhance quality of surface. Surface finish is improved by mechanical cutting action of abrasive particles on work surface. Polishing is complex in nature and research efforts have been focused on understanding the polishing mechanism. Study of changes in profile is a useful method of understanding behavior of the polishing process. Such a study requires tracing same profile at regular process intervals, which is a tedious job. An innovative relocation technique is followed in the present work to study profile changes during mechanical polishing of austenitic stainless steel specimen. Using special locating fixture, micro-indentation mark and cross-correlation technique, the same profile is traced at certain process intervals. Comparison of different parameters of profiles shows the manner in which metal removal takes place in the polishing process. Mass removal during process estimated by the same relocation technique is checked with that obtained using weight measurement. The proposed approach can be extended to other micro/nano finishing processes and favorable process conditions can be identified.

Assessment of late cardiomyopathy by magnetic resonance imaging in patients with acute promyelocytic leukaemia treated with all-trans retinoic acid and idarubicin.

PubMed

Rodríguez-Veiga, Rebeca; Igual, Begoña; Montesinos, Pau; Tormo, Mar; Sayas, Mª José; Linares, Mariano; Fernández, José María; Salvador, Antonio; Maceira-González, Alicia; Estornell, Jordi; Calabuig, Marisa; Pedreño, María; Roig, Mónica; Sanz, Jaime; Sanz, Guillermo; Carretero, Carlos; Boluda, Blanca; Martínez-Cuadrón, David; Sanz, Miguel Ángel

2017-07-01

Late cardiomyopathy CMP is regarded as a potential severe long-term complication after anthracycline-based regimens for acute promyelocitic leukaemia (APL). We assess by MRI the incidence and severity of clinical and subclinical long-term CMP in a cohort of adult APL patients in first complete remission with PETHEMA trials. Adult patients diagnosed with APL in first complete remission lasting ≥2 years underwent anamnesis and physical examination and were asked to perform a cardiac MRI. Clinical CMP was defined as radiographic and physical signs of heart failure accompanied by symptoms or by left ventricle ejection fraction (LVEF) <45% by MRI with or without symptoms. Subclinical CMP was defined as the following MRI abnormalities: LVEF 45-50% or late gadolinium enhancement or two or more of LVEF ≤55%, left ventricle end-diastolic volume index ≥98 ml/m 2 , left ventricle end-systolic volume index ≥38 ml/m 2 , right ventricle end-diastolic volume index ≥106 ml/m 2 and regional wall motion abnormalities. Of the 82 patients enrolled in the study, median cumulative dose of anthracyclines (doxorubicin equivalence) was 650 mg/m 2 , and median time from APL diagnosis to the study was 87 months (range, 24-195). Seven out of 57 patients with available MRI (12%) had subclinical CMP (all of them showed late gadolinium enhancement in MRI), and none had clinical CMP. Among the 25 patients without MRI, none had CMP by chest X-ray and physical assessment. In summary, we found 12% of subclinical and no clinical late CMP assessed by MRI in APL patients treated with PETHEMA protocols. Due to the low number of patients, we must interpret our results cautiously.

In vivo evidence of cross-reactivity between cow's milk and soybean proteins in a mouse model of food allergy.

PubMed

Smaldini, Paola; Curciarello, Renata; Candreva, Angela; Rey, María Amanda; Fossati, Carlos Alberto; Petruccelli, Silvana; Docena, Guillermo Horacio

2012-01-01

Cow's milk allergy (CMA) is an important problem worldwide and the development of an in vivo system to study new immunotherapeutic strategies is of interest. Intolerance to soybean formula has been described in CMA patients, but it is not fully understood. In this work, we used a food allergy model in BALB/c mice to study the cross-reactivity between cow's milk protein (CMP) and soy proteins (SP). Mice were orally sensitized with cholera toxin and CMP, and then challenged with CMP or SP to induce allergy. Elicited symptoms, plasma histamine, humoral and cellular immune response were analyzed. Th1- and Th2-associated cytokines and transcription factors were assessed at mucosal sites and in splenocytes. Cutaneous tests were also performed. We found that the immediate symptoms elicited in CMP-sensitized mice orally challenged with SP were consistent with a plasma histamine increase. The serum levels of CMP-specific IgE and IgG1 antibodies were increased. These antibodies also recognized soy proteins. Splenocytes and mesenteric lymph node cells incubated with CMP or SP secreted IL-5 and IL-13. mRNA expression of Th2-associated genes (IL-5, IL-13, and GATA-3) was upregulated in mucosal samples. In addition, sensitized animals exhibited positive cutaneous tests after the injection of CMP or SP. We demonstrate that CMP-sensitized mice, without previous exposure to soy proteins, elicited hypersensitivity signs immediately after the oral administration of SP, suggesting that the immunochemical cross-reactivity might be clinically relevant. This model may provide an approach to further characterize cross-allergenicity phenomena and develop new immunotherapeutic treatments for allergic patients. Copyright © 2012 S. Karger AG, Basel.

Electro-Analytical Study of Material Interfaces Relevant for Chemical Mechanical Planarization and Lithium Ion Batteries

NASA Astrophysics Data System (ADS)

Turk, Michael C.

This dissertation work involves two areas of experimental research, focusing specifically on the applications of electro-analytical techniques for interfacial material characterization. The first area of the work is centered on the evaluation and characterization of material components used for chemical mechanical planarization (CMP) in the fabrication of semiconductor devices. This part also represents the bulk of the projects undertaken for the present dissertation. The other area of research included here involves exploratory electrochemical studies of certain electrolyte and electrode materials for applications in the development of advanced lithium ion secondary batteries. The common element between the two areas of investigation is the technical approach that combines a broad variety of electro-analytical characterization techniques to examine application specific functions of the associated materials and devices. The CMP related projects concentrate on designing and evaluating materials for CMP slurries that would be useful in the processing of copper interconnects for the sub-22 nm technology node. Specifically, ruthenium and cobalt are nontraditional barrier materials currently considered for the new interconnects. The CMP schemes used to process the structures based on these metals involve complex surface chemistries of Ru, Co and Cu (used for wiring lines). The strict requirement of defect-control while maintaining material removal by precisely regulated tribo-corrosion complicates the designs of the CMP slurries needed to process these systems. Since Ru is electrochemically more noble than Cu, the surface regions of Cu assembled in contact with Ru tend to generate defects due to galvanic corrosion in the CMP environment. At the same time, Co is strongly reactive in the typical slurry environment and is prone to developing galvanic corrosion induced by Cu. The present work explores a selected class of alkaline slurry formulations aimed at reducing these galvanic corrosions in chemically controlled low-pressure CMP. The CMP specific functions of the slurry components are characterized in the tribo-electro-analytical approach by using voltammetry, open circuit potential (OCP) measurements and electrochemical impedance spectroscopy (EIS) in the presence as well as in the absence of surface abrasion, both with and without the inclusion of colloidal silica (SiO2) abrasives. The results are used to understand the reaction mechanisms responsible for supporting material removal and corrosion suppression. The project carried out in the area of Li ion batteries (LIBs) uses electro-analytical techniques to probe electrolyte characteristics as well as electrode material performance. The investigation concentrates on optimizing a tactically chosen set of electrolyte compositions for low-to-moderate temperature applications of lithium titanium oxide (LTO), a relatively new anode material for such batteries. For this application, mixtures of non-aqueous carbonate based solvents are studied in combination with lithium perchlorate. The temperature dependent conductivities of the electrolytes are rigorously measured and analyzed using EIS. The experimental considerations and the working principle of this EIS based approach are carefully examined and standardized in the course of this study. These experiments also investigate the effects of temperature variations (below room temperature) on the solid electrolyte interphase (SEI) formation characteristics of LTO in the given electrolytes. This dissertation is organized as follows: Each experimental system and its relevance for practical applications are briefly introduced in each chapter. The experimental approach and the motivation for carrying out the investigation are also noted in that context. The experimental details specific to the particular study are described. This is followed by the results and their discussion, and subsequently, by the specific conclusions drawn from the given set of experiments. A general summary of the obtained results is presented at the end of the dissertation. Possible extensions of the present studies have also been briefly noted there.

Multi-functional composite materials for catalysis and chemical mechanical planarization

NASA Astrophysics Data System (ADS)

Coutinho, Cecil A.

2009-12-01

Composite materials formed from two or more functionally different materials offer a versatile avenue to create a tailored material with well defined traits. Within this dissertation research, multi-functional composites were synthesized based on organic and inorganic materials. The functionally of these composites was experimentally tested and a semi-empirical model describing the sedimentation behavior of these particles was developed. This first objective involved the fabrication of microcomposites consisting of titanium dioxide (TiO2) nanoparticles confined within porous, microgels of a thermo-responsive polymer for use in the photocatalytic treatment of wastewater. TiO2 has been shown to be an excellent photocatalyst with potential applications in advanced oxidative processes such as wastewater remediation. Upon UV irradiation, short-lived electron-hole pairs are generated, which produce oxidative species that degrade simple organic contaminants. The rapid sedimentation of these microcomposites provided an easy gravimetric separation after remediation. Methyl orange was used as a model organic contaminant to investigate the kinetics of photodegradation under a range of concentrations and pH conditions. Although after prolonged periods of UV irradiation (˜8-13 hrs), the titania-microgels also degrade, regeneration of the microcomposites was straightforward via the addition of polymer microgels with no loss in photocatalytic activity of the reformed microcomposites. The second objective within this dissertation involved the systematic development of abrasive microcomposite particles containing well dispersed nanoparticles of ceria in an organic/inorganic hybrid polymeric particle for use in chemical mechanical polishing/planarization (CMP). A challenge in IC fabrication involves the defect-free planarization of silicon oxide films for successful multi-layer deposition. Planarization studies conducted with the microcomposites prepared in this research, yield very smooth, planar surfaces with removal rates that rival those of inorganic oxides slurries typically used in industry. The density and size of these ceria-microgel particles could be controlled by varying the temperature or composition during synthesis, leading to softer or harder polishing when desired.

Novel cytidine-based orotidine-5'-monophosphate decarboxylase inhibitors with an unusual twist.

PubMed

Purohit, Meena K; Poduch, Ewa; Wei, Lianhu William; Crandall, Ian Edward; To, Terrence; Kain, Kevin C; Pai, Emil F; Kotra, Lakshmi P

2012-11-26

Orotidine-5'-monophosphate decarboxylase (ODCase) is an interesting enzyme with an unusual catalytic activity and a potential drug target in Plasmodium falciparum, which causes malaria. ODCase has been shown to exhibit unusual and interesting interactions with a variety of nucleotide ligands. Cytidine-5'-monophosphate (CMP) is a poor ligand of ODCase, and CMP binds to the active site of ODCase with an unusual orientation and conformation. We designed N3- and N4-modified CMP derivatives as novel ligands to ODCase. These novel CMP derivatives and their corresponding nucleosides were evaluated against Plasmodium falciparum ODCase and parasitic cultures, respectively. These derivatives exhibited improved inhibition of the enzyme catalytic activity, displayed interesting binding conformations and unusual molecular rearrangements of the ligands. These findings with the modified CMP nucleotides underscored the potential of transformation of poor ligands to ODCase into novel inhibitors of this drug target.

A client-treatment matching protocol for therapeutic communities: first report.

PubMed

Melnick, G; De Leon, G; Thomas, G; Kressel, D

2001-10-01

The present study is the first report on a client-treatment matching protocol (CMP) to guide admissions to residential and outpatient substance abuse treatment settings. Two cohorts, a field test sample (n = 318) and cross-validation (n = 407) sample were drawn from consecutive admissions to nine geographically distributed multisetting therapeutic communities (TCs). A passive matching design was employed. Clients received the CMP on admission, but agencies were "blind" to the CMP treatment recommendation (i.e., match) and assigned clients to treatment by the usual intake procedures. Bivariate and logistical regression analyses show that positive treatment dispositions (treatment completion or longer retention in treatment)) were significantly higher among the CMP-matched clients. The present findings provide the empirical basis for studies assessing the validity and utility of the CMP with controlled designs. Though limited to TC-oriented agencies, the present research supports the use of objective matching criteria to improve treatment.

Computer-Controlled Cylindrical Polishing Process for Large X-Ray Mirror Mandrels

NASA Technical Reports Server (NTRS)

Khan, Gufran S.; Gubarev, Mikhail; Speegle, Chet; Ramsey, Brian

2010-01-01

We are developing high-energy grazing incidence shell optics for hard-x-ray telescopes. The resolution of a mirror shells depends on the quality of cylindrical mandrel from which they are being replicated. Mid-spatial-frequency axial figure error is a dominant contributor in the error budget of the mandrel. This paper presents our efforts to develop a deterministic cylindrical polishing process in order to keep the mid-spatial-frequency axial figure errors to a minimum. Simulation software is developed to model the residual surface figure errors of a mandrel due to the polishing process parameters and the tools used, as well as to compute the optical performance of the optics. The study carried out using the developed software was focused on establishing a relationship between the polishing process parameters and the mid-spatial-frequency error generation. The process parameters modeled are the speeds of the lap and the mandrel, the tool s influence function, the contour path (dwell) of the tools, their shape and the distribution of the tools on the polishing lap. Using the inputs from the mathematical model, a mandrel having conical approximated Wolter-1 geometry, has been polished on a newly developed computer-controlled cylindrical polishing machine. The preliminary results of a series of polishing experiments demonstrate a qualitative agreement with the developed model. We report our first experimental results and discuss plans for further improvements in the polishing process. The ability to simulate the polishing process is critical to optimize the polishing process, improve the mandrel quality and significantly reduce the cost of mandrel production

Convergent Polishing: A Simple, Rapid, Full Aperture Polishing Process of High Quality Optical Flats & Spheres

PubMed Central

Suratwala, Tayyab; Steele, Rusty; Feit, Michael; Dylla-Spears, Rebecca; Desjardin, Richard; Mason, Dan; Wong, Lana; Geraghty, Paul; Miller, Phil; Shen, Nan

2014-01-01

Convergent Polishing is a novel polishing system and method for finishing flat and spherical glass optics in which a workpiece, independent of its initial shape (i.e., surface figure), will converge to final surface figure with excellent surface quality under a fixed, unchanging set of polishing parameters in a single polishing iteration. In contrast, conventional full aperture polishing methods require multiple, often long, iterative cycles involving polishing, metrology and process changes to achieve the desired surface figure. The Convergent Polishing process is based on the concept of workpiece-lap height mismatch resulting in pressure differential that decreases with removal and results in the workpiece converging to the shape of the lap. The successful implementation of the Convergent Polishing process is a result of the combination of a number of technologies to remove all sources of non-uniform spatial material removal (except for workpiece-lap mismatch) for surface figure convergence and to reduce the number of rogue particles in the system for low scratch densities and low roughness. The Convergent Polishing process has been demonstrated for the fabrication of both flats and spheres of various shapes, sizes, and aspect ratios on various glass materials. The practical impact is that high quality optical components can be fabricated more rapidly, more repeatedly, with less metrology, and with less labor, resulting in lower unit costs. In this study, the Convergent Polishing protocol is specifically described for fabricating 26.5 cm square fused silica flats from a fine ground surface to a polished ~λ/2 surface figure after polishing 4 hr per surface on a 81 cm diameter polisher. PMID:25489745

Exploring personality dimensions that influence practice and performance of a simulated laparoscopic task in the objective structured clinical examination.

PubMed

Malhotra, Neha; Poolton, Jamie M; Wilson, Mark R; Leung, Gilberto; Zhu, Frank; Fan, Joe K M; Masters, Rich S W

2015-01-01

Surgical educators have encouraged the investigation of individual differences in aptitude and personality in surgical performance. An individual personality difference that has been shown to influence laparoscopic performance under time pressure is movement specific reinvestment. Movement specific reinvestment has 2 dimensions, movement self-consciousness (MS-C) (i.e., the propensity to consciously monitor movements) and conscious motor processing (CMP) (i.e., the propensity to consciously control movements), which have been shown to differentially influence laparoscopic performance in practice but have yet to be investigated in the context of psychological stress (e.g., the objective structured clinical examination [OSCE]). This study investigated the role of individual differences in propensity for MS-C and CMP in practice of a fundamental laparoscopic skill and in laparoscopic performance during the OSCE. Furthermore, this study examined whether individual differences during practice of a fundamental laparoscopic skill were predictive of laparoscopic performance during the OSCE. Overall, 77 final-year undergraduate medical students completed the movement specific reinvestment scale, an assessment tool that quantifies the propensity for MS-C and CMP. Participants were trained to proficiency on a fundamental laparoscopic skill. The number of trials to reach proficiency was measured, and completion times were recorded during early practice, later practice, and the OSCE. There was a trend for CMP to be negatively associated with the number of trials to reach proficiency (p = 0.064). A higher propensity for CMP was associated with fewer trials to reach proficiency (β = -0.70, p = 0.023). CMP and MS-C did not significantly predict completion times in the OSCE (p > 0.05). Completion times in early practice (β = 0.05, p = 0.016) and later practice (β = 0.47, p < 0.001) and number of trials to reach proficiency (β = 0.23, p = 0.003) significantly predicted completion times in the OSCE. It appears that a higher propensity for CMP predicts faster rates of learning of a fundamental laparoscopic skill. Furthermore, laparoscopic performance during practice is indicative of laparoscopic performance in the challenging conditions of the OSCE. The lack of association between the 2 dimensions of movement specific reinvestment and performance during the OSCE is explained using the theory of reinvestment as a framework. Overall, consideration of personality differences and individual differences in ability during practice could help inform the development of individualized surgical training programs. Copyright © 2015 Association of Program Directors in Surgery. Published by Elsevier Inc. All rights reserved.

Experimental Study on the Effects of Alumina Abrasive Particle Behavior in MR Polishing for MEMS Applications

PubMed Central

Kim, Dong-Woo; Cho, Myeong-Woo; Seo, Tae-Il; Shin, Young-Jae

2008-01-01

Recently, the magnetorheological (MR) polishing process has been examined as a new ultra-precision polishing technology for micro parts in MEMS applications. In the MR polishing process, the magnetic force plays a dominant role. This method uses MR fluids which contains micro abrasives as a polishing media. The objective of the present research is to shed light onto the material removal mechanism under various slurry conditions for polishing and to investigate surface characteristics, including shape analysis and surface roughness measurement, of spots obtained from the MR polishing process using alumina abrasives. A series of basic experiments were first performed to determine the optimum polishing conditions for BK7 glass using prepared slurries by changing the process parameters, such as wheel rotating speed and electric current. Using the obtained results, groove polishing was then performed and the results are investigated. Outstanding surface roughness of Ra=3.8nm was obtained on the BK7 glass specimen. The present results highlight the possibility of applying this polishing method to ultra-precision micro parts production, especially in MEMS applications. PMID:27879705

42 CFR 417.560 - Apportionment: Part B physician and supplier services.

Code of Federal Regulations, 2010 CFR

2010-10-01

... HMO or CMP or by a related entity of the HMO or CMP must be apportioned on the basis of the ratio of... reasonable cost the HMO or CMP pays under its financial arrangement with the physician or supplier must be apportioned between Medicare enrollees and others based on the ratio of covered services furnished to Medicare...

Timing of Bag Application and Removal in Controlled Mass Pollination

Treesearch

F.E. Bridgwater; D.L. Bramlett; V.D. Hipkins

1999-01-01

Controlled mass pollination (CMP) among outstanding parents is one way to increase genetic gains from traditional wind-pollinated seed orchards, but the economic success of CMP depends on both genetic gains and costs. CMP has been shown. to be cost-effective (Bridgwater et al. 1998) even when costs were adjusted for risk (Byram and Bridgwater 1999, These Proceedings...

42 CFR 417.460 - Disenrollment of beneficiaries by an HMO or CMP.

Code of Federal Regulations, 2011 CFR

2011-10-01

... or CMP's geographic area does not expand that area to encompass the location of the enrollee's new... to the HMO's or CMP's geographic area within 1 year from the date he or she left that area, the HMO... date the enrollee left that area in accordance with paragraph (f)(1) of this section. (g) Failure to...

42 CFR 417.460 - Disenrollment of beneficiaries by an HMO or CMP.

Code of Federal Regulations, 2010 CFR

2010-10-01

... or CMP's geographic area does not expand that area to encompass the location of the enrollee's new... to the HMO's or CMP's geographic area within 1 year from the date he or she left that area, the HMO... date the enrollee left that area in accordance with paragraph (f)(1) of this section. (g) Failure to...

Stable curcumin-loaded polymeric micellar formulation for enhancing cellular uptake and cytotoxicity to FLT3 overexpressing EoL-1 leukemic cells.

PubMed

Tima, Singkome; Anuchapreeda, Songyot; Ampasavate, Chadarat; Berkland, Cory; Okonogi, Siriporn

2017-05-01

The present study aims to develop a stable polymeric micellar formulation of curcumin (CM) with improved solubility and stability, and that is suitable for clinical applications in leukemia patients. CM-loaded polymeric micelles (CM-micelles) were prepared using poloxamers. The chemical structure of the polymers influenced micellar properties. The best formulation of CM-micelles, namely CM-P407, was obtained from poloxamer 407 at drug to polymer ratio of 1:30 and rehydrated with phosphate buffer solution pH 7.4. CM-P407 exhibited the smallest size of 30.3±1.3nm and highest entrapment efficiency of 88.4±4.1%. When stored at -80°C for 60days, CM-P407 retained high protection of CM and had no significant size change. In comparison with CM solution in dimethyl sulfoxide (CM-DMSO), CM kinetic degradation in both formulations followed a pseudo-first-order reaction, but the half-life of CM in CM-P407 was approx. 200 times longer than in CM-DMSO. Regarding the activity against FLT3 overexpressing EoL-1 leukemic cells, CM-P407 showed higher cytotoxicity than CM-DMSO. Moreover, intracellular uptake to leukemic cells of CM-P407 was 2-3 times greater than that of CM-DMSO. These promising results for CM-P407 will be further investigated in rodents and in clinical studies for leukemia treatment. Copyright © 2017 Elsevier B.V. All rights reserved.

Design Considerations of Polishing Lap for Computer-Controlled Cylindrical Polishing Process

NASA Technical Reports Server (NTRS)

Khan, Gufran S.; Gubarev, Mikhail; Arnold, William; Ramsey, Brian D.

2009-01-01

This paper establishes a relationship between the polishing process parameters and the generation of mid spatial-frequency error. The consideration of the polishing lap design to optimize the process in order to keep residual errors to a minimum and optimization of the process (speeds, stroke, etc.) and to keep the residual mid spatial-frequency error to a minimum, is also presented.

Deterministic Computer-Controlled Polishing Process for High-Energy X-Ray Optics

NASA Technical Reports Server (NTRS)

Khan, Gufran S.; Gubarev, Mikhail; Speegle, Chet; Ramsey, Brian

2010-01-01

A deterministic computer-controlled polishing process for large X-ray mirror mandrels is presented. Using tool s influence function and material removal rate extracted from polishing experiments, design considerations of polishing laps and optimized operating parameters are discussed

Engineering Sialic Acid Synthesis Ability in Insect Cells.

PubMed

Viswanathan, Karthik; Narang, Someet; Betenbaugh, Michael J

2015-01-01

Insect cells lack the ability to synthesize the sialic acid donor molecule CMP-sialic acid or its precursor, sialic acid. In this chapter, we describe a method to engineer CMP-sialic acid synthesis capability into Spodoptera frugiperda (Sf9) cells, a prototypical insect cell line, by recombinant expression of sialic acid synthesis pathway genes using baculovirus technology. Co-expression of a sialuria mutant UDP-GlcNAc-2-epimerase/ManNAc kinase (EKR263L), wild-type sialic acid 9-phosphate synthase (SAS), and wild-type CMP-sialic acid synthetase (CSAS) in the presence of GlcNAc leads to synthesis of CMP-sialic acids synthesis to support sialylation of N-glycans on glycoproteins.

Radical scavenger can scavenge lipid allyl radicals complexed with lipoxygenase at lower oxygen content.

PubMed

Koshiishi, Ichiro; Tsuchida, Kazunori; Takajo, Tokuko; Komatsu, Makiko

2006-04-15

Lipoxygenases have been proposed to be a possible factor that is responsible for the pathology of certain diseases, including ischaemic injury. In the peroxidation process of linoleic acid by lipoxygenase, the E,Z-linoleate allyl radical-lipoxygenase complex seems to be generated as an intermediate. In the present study, we evaluated whether E,Z-linoleate allyl radicals on the enzyme are scavenged by radical scavengers. Linoleic acid, the content of which was greater than the dissolved oxygen content, was treated with soya bean lipoxygenase-1 (ferric form) in the presence of radical scavenger, CmP (3-carbamoyl-2,2,5,5-tetramethylpyrrolidine-N-oxyl). The reaction rate between oxygen and lipid allyl radical is comparatively faster than that between CmP and lipid allyl radical. Therefore a reaction between linoleate allyl radical and CmP was not observed while the dioxygenation of linoleic acid was ongoing. After the dissolved oxygen was depleted, CmP stoichiometrically trapped linoleate-allyl radicals. Accompanied by this one-electron redox reaction, the resulting ferrous lipoxygenase was re-oxidized to the ferric form by hydroperoxylinoleate. Through the adduct assay via LC (liquid chromatography)-MS/MS (tandem MS), four E,Z-linoleate allyl radical-CmP adducts corresponding to regio- and diastereo-isomers were detected in the linoleate/lipoxygenase system, whereas E,E-linoleate allyl radical-CmP adducts were not detected at all. If E,Z-linoleate allyl radical is liberated from the enzyme, the E/Z-isomer has to reach equilibrium with the thermodynamically favoured E/E-isomer. These data suggested that the E,Z-linoleate allyl radicals were not liberated from the active site of lipoxygenase before being trapped by CmP. Consequently, we concluded that the lipid allyl radicals complexed with lipoxygenase could be scavenged by radical scavengers at lower oxygen content.

Radical scavenger can scavenge lipid allyl radicals complexed with lipoxygenase at lower oxygen content

PubMed Central

Koshiishi, Ichiro; Tsuchida, Kazunori; Takajo, Tokuko; Komatsu, Makiko

2006-01-01

Lipoxygenases have been proposed to be a possible factor that is responsible for the pathology of certain diseases, including ischaemic injury. In the peroxidation process of linoleic acid by lipoxygenase, the E,Z-linoleate allyl radical–lipoxygenase complex seems to be generated as an intermediate. In the present study, we evaluated whether E,Z-linoleate allyl radicals on the enzyme are scavenged by radical scavengers. Linoleic acid, the content of which was greater than the dissolved oxygen content, was treated with soya bean lipoxygenase-1 (ferric form) in the presence of radical scavenger, CmP (3-carbamoyl-2,2,5,5-tetramethylpyrrolidine-N-oxyl). The reaction rate between oxygen and lipid allyl radical is comparatively faster than that between CmP and lipid allyl radical. Therefore a reaction between linoleate allyl radical and CmP was not observed while the dioxygenation of linoleic acid was ongoing. After the dissolved oxygen was depleted, CmP stoichiometrically trapped linoleate-allyl radicals. Accompanied by this one-electron redox reaction, the resulting ferrous lipoxygenase was re-oxidized to the ferric form by hydroperoxylinoleate. Through the adduct assay via LC (liquid chromatography)–MS/MS (tandem MS), four E,Z-linoleate allyl radical–CmP adducts corresponding to regio- and diastereo-isomers were detected in the linoleate/lipoxygenase system, whereas E,E-linoleate allyl radical–CmP adducts were not detected at all. If E,Z-linoleate allyl radical is liberated from the enzyme, the E/Z-isomer has to reach equilibrium with the thermodynamically favoured E/E-isomer. These data suggested that the E,Z-linoleate allyl radicals were not liberated from the active site of lipoxygenase before being trapped by CmP. Consequently, we concluded that the lipid allyl radicals complexed with lipoxygenase could be scavenged by radical scavengers at lower oxygen content. PMID:16396633

Subsurface Damage in Polishing Process of Silicon Carbide Ceramic

PubMed Central

Gu, Yan; Zhu, Wenhui; Lin, Jieqiong; Lu, Mingming; Kang, Mingshuo

2018-01-01

Subsurface damage (SSD) in the polishing process of silicon carbide (SiC) ceramic presents one of the most significant challenges for practical applications. In this study, the theoretical models of SSD depth are established on the basis of the material removal mechanism and indentation fracture mechanics in the SiC ceramic polishing process. In addition, the three-dimensional (3D) models of single grit polishing are also developed by using the finite element simulation; thereby, the dynamic effects of different process parameters on SSD depth are analyzed. The results demonstrate that the material removal was mainly in brittle mode when the cutting depth was larger than the critical depth of the brittle material. The SSD depth increased as the polishing depth and abrasive grain size increased, and decreased with respect to the increase in polishing speed. The experimental results suggested a good agreement with the theoretical simulation results in terms of SSD depth as a function of polishing depth, spindle speed, and abrasive grain size. This study provides a mechanistic insight into the dependence of SSD on key operational parameters in the polishing process of SiC ceramic. PMID:29584694

Distinct Signaling Roles of cIMP, cCMP, and cUMP.

PubMed

Seifert, Roland

2016-10-04

The cyclic purine nucleotide cIMP and the cyclic pyrimidine nucleotides cCMP and cUMP are emerging second messengers. These cNMPs show different biological effects, but the molecular mechanisms remain elusive. In this issue of Structure, Ng et al. (2016) provide structural evidence for distinct interactions of cIMP, cCMP, and cUMP with ion channels. Copyright © 2016 Elsevier Ltd. All rights reserved.

Medicinal Chemistry of the Noncanonical Cyclic Nucleotides cCMP and cUMP.

PubMed

Schwede, Frank; Rentsch, Andreas; Genieser, Hans-Gottfried

2017-01-01

After decades of intensive research on adenosine-3',5'-cyclic monophosphate (cAMP)- and guanosine-3',5'-cyclic monophosphate (cGMP)-related second messenger systems, also the noncanonical congeners cyclic cytidine-3',5'-monophosphate (cCMP) and cyclic uridine-3',5'-monophosphate (cUMP) gained more and more interest. Until the late 1980s, only a small number of cCMP and cUMP analogs with sometimes undefined purities had been described. Moreover, most of these compounds had been rather synthesized as precursors of antitumor and antiviral nucleoside-5'-monophosphates and hence had not been tested for any second messenger activity. Along with the recurring interest in cCMP- and cUMP-related signaling in the early 2000s, it became evident that well-characterized small molecule analogs with reliable purities would serve as highly valuable tools for the evaluation of a putative second messenger role of cyclic pyrimidine nucleotides. Meanwhile, for this purpose new cCMP and cUMP derivatives have been developed, and already known analogs have been resynthesized and highly purified. This chapter summarizes early medicinal chemistry work on cCMP and cUMP and analogs thereof, followed by a description of recent synthetic developments and an outlook on potential future directions.

Silicon-on-insulator with hybrid orientations for heterogeneous integration of GaN on Si (100) substrate

NASA Astrophysics Data System (ADS)

Zhang, Runchun; Zhao, Beiji; Huang, Kai; You, Tiangui; Jia, Qi; Lin, Jiajie; Zhang, Shibin; Yan, Youquan; Yi, Ailun; Zhou, Min; Ou, Xin

2018-05-01

Heterogeneous integration of materials pave a new way for the development of the microsystem with miniaturization and complex functionalities. Two types of hybrid silicon on insulator (SOI) structures, i.e., Si (100)-on-Si (111) and Si (111)-on-Si (100), were prepared by the smart-cut technique, which is consist of ion-slicing and wafer bonding. The precise calculation of the lattice strain of the transferred films without the epitaxial matching relationship to the substrate was demonstrated based on X-ray diffraction (XRD) measurements. The XRD and Raman measurement results suggest that the transferred films possess single crystalline quality. With a chemical mechanical polishing (CMP) process, the surface roughness of the transferred thin films can be reduced from 5.57 nm to 0.30 nm. The 4-inch GaN thin film epitaxially grown on the as-prepared hybrid SOI of Si (111)-on-Si (100) by metalorganic chemical vapor deposition (MOCVD) is of improved quality with a full width at half maximum (FWHM) of 672.54 arcsec extracted from the XRD rocking curve and small surface roughness of 0.40 nm. The wafer-scale GaN on Si (111)-on-Si (100) can serve as a potential platform for the one chip integration of GaN-based high electron mobility transistors (HEMT) or photonics with the Si (100)-based complementary metal oxide semiconductor (CMOS).

Matrix Metalloproteinases and their Tissue Inhibitors in Cardiac Amyloidosis: Relationship to Structural, Functional Myocardial Changes and to Light Chain Amyloid Deposition

PubMed Central

Biolo, Andreia; Ramamurthy, Sujata; Connors, Lawreen H.; O'Hara, Carl J.; Meier-Ewert, Hans K.; Hoo, Pamela T. Soo; Sawyer, Douglas B.; Seldin, David S.; Sam, Flora

2009-01-01

Background Cardiac amyloidosis is characterized by amyloid infiltration resulting in extracellular matrix (ECM) disruption. Amyloid cardiomyopathy due to immunoglobulin light chain protein (AL-CMP) deposition, has an accelerated clinical course and a worse prognosis compared to non-light chain cardiac amyloidoses i.e., forms associated with wild-type or mutated transthyretin (TTR). We therefore tested the hypothesis that determinants of proteolytic activity of the ECM, the matrix metalloproteinases (MMPs) and their tissue inhibitors (TIMPs), would have distinct patterns and contribute to the pathogenesis of AL-CMP vs. TTR. Methods / Results We studied 40 patients with systemic amyloidosis: 10 AL-CMP patients, 20 patients with TTR-associated forms of cardiac amyloidosis, i.e. senile systemic amyloidois (SSA, involving wild-type TTR) or mutant TTR (ATTR), and 10 patients with AL amyloidosis without cardiac involvement. Serum MMP-2 and −9, TIMP-1, −2 and −4, brain natriuretic peptide (BNP) values and echocardiography were determined. AL-CMP and SSA-ATTR groups had similar degrees of increased left ventricular wall thickness (LVWT). However, BNP, MMP-9 and TIMP-1 levels were distinctly elevated accompanied by marked diastolic dysfunction in the AL-CMP group vs. no or minimal increases in the SSA-ATTR group. BNP, MMPs and TIMPs were not correlated with the degree of LVWT but were correlated to each other and to measures of diastolic dysfunction. Immunostaining of human endomyocardial biopsies showed diffuse expression of MMP-9 and TIMP-1 in AL-CMP and limited expression in SSA or ATTR hearts. Conclusions Despite comparable LVWT with TTR-related cardiac amyloidosis, AL-CMP patients have higher BNP, MMPs and TIMPs, which correlated with diastolic dysfunction. These findings suggest a relationship between light chains and ECM proteolytic activation that may play an important role in the functional and clinical manifestations of AL-CMP, distinct from the other non-light chain cardiac amyloidoses. PMID:19808299

Acupuncture and chiropractic care for chronic pain in an integrated health plan: a mixed methods study

PubMed Central

2011-01-01

Background Substantial recent research examines the efficacy of many types of complementary and alternative (CAM) therapies. However, outcomes associated with the "real-world" use of CAM has been largely overlooked, despite calls for CAM therapies to be studied in the manner in which they are practiced. Americans seek CAM treatments far more often for chronic musculoskeletal pain (CMP) than for any other condition. Among CAM treatments for CMP, acupuncture and chiropractic (A/C) care are among those with the highest acceptance by physician groups and the best evidence to support their use. Further, recent alarming increases in delivery of opioid treatment and surgical interventions for chronic pain--despite their high costs, potential adverse effects, and modest efficacy--suggests the need to evaluate real world outcomes associated with promising non-pharmacological/non-surgical CAM treatments for CMP, which are often well accepted by patients and increasingly used in the community. Methods/Design This multi-phase, mixed methods study will: (1) conduct a retrospective study using information from electronic medical records (EMRs) of a large HMO to identify unique clusters of patients with CMP (e.g., those with differing demographics, histories of pain condition, use of allopathic and CAM health services, and comorbidity profiles) that may be associated with different propensities for A/C utilization and/or differential outcomes associated with such care; (2) use qualitative interviews to explore allopathic providers' recommendations for A/C and patients' decisions to pursue and retain CAM care; and (3) prospectively evaluate health services/costs and broader clinical and functional outcomes associated with the receipt of A/C relative to carefully matched comparison participants receiving traditional CMP services. Sensitivity analyses will compare methods relying solely on EMR-derived data versus analyses supplementing EMR data with conventionally collected patient and clinician data. Discussion Successful completion of these aggregate aims will provide an evaluation of outcomes associated with the real-world use of A/C services. The trio of retrospective, qualitative, and prospective study will also provide a clearer understanding of the decision-making processes behind the use of A/C for CMP and a transportable methodology that can be applied to other health care settings, CAM treatments, and clinical populations. Trial registration ClinicalTrials.gov: NCT01345409 PMID:22118061

The role of health information technology in advancing care management and coordination in accountable care organizations.

PubMed

Wu, Frances M; Shortell, Stephen M; Rundall, Thomas G; Bloom, Joan R

To be successful, accountable care organizations (ACOs) must effectively manage patient care. Health information technology (HIT) can support care delivery by providing various degrees of coordination. Few studies have examined the role of HIT functionalities or the role of different levels of coordination enabled by HIT on care management processes. We examine HIT functionalities in ACOs, categorized by the level of coordination they enable in terms of information and work flow, to determine which specific HIT functionalities and levels of coordination are most strongly associated with care management processes. Retrospective cross-sectional analysis was done using 2012 data from the National Survey of Accountable Care Organizations. HIT functionalities are categorized into coordination levels: information capture, the lowest level, which coordinates through standardization; information provision, which supports unidirectional activities; and information exchange, which reflects the highest level of coordination allowing for bidirectional exchange. The Care Management Process index (CMP index) includes 13 questions about the extent to which care is planned, monitored, and supported by providers and patients. Multiple regressions adjusting for organizational and ACO contractual factors are used to assess relationships between HIT functionalities and the CMP index. HIT functionality coordinating the most complex interdependences (information exchange) was associated with a 0.41 standard deviation change in the CMP index (β = .41, p < .001), but the associations for information capture (β = -.01, p = .97) and information provision (β = .15, p = .48) functionalities were not significant. The current study has shed some light on the relationship between HIT and care management processes by specifying the coordination roles that HIT may play and, in particular, the importance of information exchange functionalities. Although these represent early findings, further research can help policy makers and clinical leaders understand how to prioritize HIT development given resource constraints.

A novel highly selective 5-HT6 receptor antagonist attenuates ethanol and nicotine seeking but does not affect inhibitory response control in Wistar rats.

PubMed

de Bruin, N M W J; McCreary, A C; van Loevezijn, A; de Vries, T J; Venhorst, J; van Drimmelen, M; Kruse, C G

2013-01-01

Recent studies suggest a potential role for 5-hydroxytryptamine(6) (5-HT(6)) receptors in the regulation of addictive behavior. In the present study, our aim was to investigate whether the novel highly selective 5-HT(6) receptor antagonist compound (CMP) 42 affected nicotine and ethanol seeking behavior in Wistar rats. We have also studied whether CMP 42 had beneficial effects in a model of impulse control, as measured in the 5-choice serial reaction time task (5-CSRTT). Rats were trained to nose poke to receive intravenous infusions of nicotine or an ethanol drop. CMP 42 (3-30 mg/kg intraperitoneally, i.p.) was administered to investigate the effects on nicotine self-administration. Rats were also tested for cue-induced reinstatement of nicotine and ethanol seeking. In addition, the effects of CMP 42 were studied on the number of anticipatory responses in the 5-CSRTT. CMP 42 was effective in reducing nicotine self-administration and reinstatement of nicotine seeking at a dose of 30 mg/kg (i.p.). CMP 42 was also effective in reducing reinstatement of ethanol seeking (30 mg/kg i.p.). In contrast, CMP 42 did not affect anticipatory responding at doses tested, indicating no effects on impulse control. These results add to a body of evidence implicating the 5-HT(6) receptor as a viable target for the control of drug abuse. Specifically, we demonstrated for the first time effects on nicotine self-administration and on nicotine and ethanol reinstatement. Further, these effects are probably not mediated by effects on impulse control. Copyright © 2012 Elsevier B.V. All rights reserved.

Microbiomes of Endodontic-Periodontal Lesions before and after Chemomechanical Preparation.

PubMed

Gomes, Brenda P F A; Berber, Vanessa B; Kokaras, Alexis S; Chen, Tsute; Paster, Bruce J

2015-12-01

This study was conducted to evaluate the microbiomes of endodontic-periodontal lesions before and after chemomechanical preparation (CMP). Clinical samples were taken from 15 root canals (RCs) with necrotic pulp tissues and from their associated periodontal pockets (PPs) (n = 15) of teeth with endodontic-periodontal lesions before and after CMP. The Human Oral Microbe Identification using Next Generation Sequencing (NGS) protocol and viable culture were used to analyze samples from RCs and PPs. The Mann-Whitney U test and Benjamini-Hochberg corrections were performed to correlate the clinical and radiographic findings with microbial findings (P < .05). Bacteria were detected in 100% of the samples in both sites (15/15) using NGS. Firmicutes was the most predominant phylum in both sites using both methods. The most frequently detected species in the RCs before and after CMP using NGS were Enterococcus faecalis, Parvimonas micra, Mogibacterium timidum, Filifactor alocis, and Fretibacterium fastidiosum. The species most frequently detected in the PPs before and after CMP using NGS were P. micra, E. faecalis, Streptococcus constellatus, Eubacterium brachy, Tannerella forsythia, and F. alocis. Associations were found between periapical lesions ≤ 2 mm and Desulfobulbus sp oral taxon 041 and with periodontal pockets ≥ 6 mm and Dialister invisius and Peptostreptococcus stomatis (all P < .05, found in the RCs before CMP). It is concluded that the microbial community present in combined endodontic-periodontal lesions is complex and more diverse than previously reported. It is important to note that bacteria do survive in some root canals after CMP. Finally, the similarity between the microbiota of both sites, before and after CMP, suggests there may be a pathway of infection between the pulp and periodontium. Copyright © 2015 American Association of Endodontists. Published by Elsevier Inc. All rights reserved.

The role of hydroxo-bridged dinuclear species and the influence of "innocent" buffers in the reactivity of cis-[Co(III)(cyclen)(H₂O)₂]³⁺ and [Co(III)(tren)(H₂O)₂]³⁺ complexes with biologically relevant ligands at physiological pH.

PubMed

Basallote, Manuel G; Martínez, Manuel; Vázquez, Marta

2014-07-28

In view of the relevance of the reactivity of inert tetraamine Co(III) complexes having two substitutionally active cis positions capable of interact with biologically relevant ligands, the study of the reaction of cis-[Co(cyclen)(H2O)2](3+) and [Co(tren)(H2O)2](3+) with chlorides, inorganic phosphate and 5'-CMP (5'-cytidinemonophosphate) has been pursued at physiological pH. The results indicate that, in addition to the actuation of the expected labilising conjugate-base mechanism, the formation of mono and inert bis hydroxo-bridged species is relevant for understanding their speciation and reactivity. The reactivity pattern observed also indicates the key role played by the "innocent" buffers frequently used in most in vitro studies, which can make the results unreliable in many cases. The differences between the reactivity of inorganic and biologically relevant phosphates has also been found to be remarkable, with outer-sphere hydrogen bonding interactions being a dominant factor for the process. While for the inorganic phosphate substitution process the formation of μ-η(2)-OPO2O represents the termination of the reactivity monitored, for 5'-CMP only the formation of η(1)-OPO3 species is observed, which evolve with time to the final dead-end bis hydroxo-bridged complexes. The promoted hydrolysis of the 5'-CMP phosphate has not been observed in any of the processes studied.

An innovative method of ocular prosthesis fabrication by bio-CAD and rapid 3-D printing technology: A pilot study.

PubMed

Alam, Md Shahid; Sugavaneswaran, M; Arumaikkannu, G; Mukherjee, Bipasha

2017-08-01

Ocular prosthesis is either a readymade stock shell or custom made prosthesis (CMP). Presently, there is no other technology available, which is either superior or even comparable to the conventional CMP. The present study was designed to fabricate ocular prosthesis using computer aided design (CAD) and rapid manufacturing (RM) technology and to compare it with custom made prosthesis (CMP). The ocular prosthesis prepared by CAD was compared with conventional CMP in terms of time taken for fabrication, weight, cosmesis, comfort, and motility. Two eyes of two patients were included. Computerized tomography scan of wax model of socket was converted into three dimensional format using Materialize Interactive Medical Image Control System (MIMICS)software and further refined. This was given as an input to rapid manufacturing machine (Polyjet 3-D printer). The final painting on prototype was done by an ocularist. The average effective time required for fabrication of CAD prosthesis was 2.5 hours; and weight 2.9 grams. The same for CMP were 10 hours; and 4.4 grams. CAD prosthesis was more comfortable for both the patients. The study demonstrates the first ever attempt of fabricating a complete ocular prosthesis using CAD and rapid manufacturing and comparing it with conventional CMP. This prosthesis takes lesser time for fabrication, and is more comfortable. Studies with larger sample size will be required to further validate this technique.

Application of AI methods to aircraft guidance and control

NASA Technical Reports Server (NTRS)

Hueschen, Richard M.; Mcmanus, John W.

1988-01-01

A research program for integrating artificial intelligence (AI) techniques with tools and methods used for aircraft flight control system design, development, and implementation is discussed. The application of the AI methods for the development and implementation of the logic software which operates with the control mode panel (CMP) of an aircraft is presented. The CMP is the pilot control panel for the automatic flight control system of a commercial-type research aircraft of Langley Research Center's Advanced Transport Operating Systems (ATOPS) program. A mouse-driven color-display emulation of the CMP, which was developed with AI methods and used to test the AI software logic implementation, is discussed. The operation of the CMP was enhanced with the addition of a display which was quickly developed with AI methods. The display advises the pilot of conditions not satisfied when a mode does not arm or engage. The implementation of the CMP software logic has shown that the time required to develop, implement, and modify software systems can be significantly reduced with the use of the AI methods.

Statistical metrology—measurement and modeling of variation for advanced process development and design rule generation

NASA Astrophysics Data System (ADS)

Boning, Duane S.; Chung, James E.

1998-11-01

Advanced process technology will require more detailed understanding and tighter control of variation in devices and interconnects. The purpose of statistical metrology is to provide methods to measure and characterize variation, to model systematic and random components of that variation, and to understand the impact of variation on both yield and performance of advanced circuits. Of particular concern are spatial or pattern-dependencies within individual chips; such systematic variation within the chip can have a much larger impact on performance than wafer-level random variation. Statistical metrology methods will play an important role in the creation of design rules for advanced technologies. For example, a key issue in multilayer interconnect is the uniformity of interlevel dielectric (ILD) thickness within the chip. For the case of ILD thickness, we describe phases of statistical metrology development and application to understanding and modeling thickness variation arising from chemical-mechanical polishing (CMP). These phases include screening experiments including design of test structures and test masks to gather electrical or optical data, techniques for statistical decomposition and analysis of the data, and approaches to calibrating empirical and physical variation models. These models can be integrated with circuit CAD tools to evaluate different process integration or design rule strategies. One focus for the generation of interconnect design rules are guidelines for the use of "dummy fill" or "metal fill" to improve the uniformity of underlying metal density and thus improve the uniformity of oxide thickness within the die. Trade-offs that can be evaluated via statistical metrology include the improvements to uniformity possible versus the effect of increased capacitance due to additional metal.

Growing Aligned Carbon Nanotubes for Interconnections in ICs

NASA Technical Reports Server (NTRS)

Li, Jun; Ye, Qi; Cassell, Alan; Ng, Hou Tee; Stevens, Ramsey; Han, Jie; Meyyappan, M.

2005-01-01

A process for growing multiwalled carbon nanotubes anchored at specified locations and aligned along specified directions has been invented. Typically, one would grow a number of the nanotubes oriented perpendicularly to a silicon integrated-circuit (IC) substrate, starting from (and anchored on) patterned catalytic spots on the substrate. Such arrays of perpendicular carbon nanotubes could be used as electrical interconnections between levels of multilevel ICs. The process (see Figure 1) begins with the formation of a layer, a few hundred nanometers thick, of a compatible electrically insulating material (e.g., SiO(x) or Si(y)N(z) on the silicon substrate. A patterned film of a suitable electrical conductor (Al, Mo, Cr, Ti, Ta, Pt, Ir, or doped Si), having a thickness between 1 nm and 2 m, is deposited on the insulating layer to form the IC conductor pattern. Next, a catalytic material (usually, Ni, Fe, or Co) is deposited to a thickness between 1 and 30 nm on the spots from which it is desired to grow carbon nanotubes. The carbon nanotubes are grown by plasma-enhanced chemical vapor deposition (PECVD). Unlike the matted and tangled carbon nanotubes grown by thermal CVD, the carbon nanotubes grown by PECVD are perpendicular and freestanding because an electric field perpendicular to the substrate is used in PECVD. Next, the free space between the carbon nanotubes is filled with SiO2 by means of CVD from tetraethylorthosilicate (TEOS), thereby forming an array of carbon nanotubes embedded in SiO2. Chemical mechanical polishing (CMP) is then performed to remove excess SiO2 and form a flat-top surface in which the outer ends of the carbon nanotubes are exposed. Optionally, depending on the application, metal lines to connect selected ends of carbon nanotubes may be deposited on the top surface. The top part of Figure 2 is a scanning electron micrograph (SEM) of carbon nanotubes grown, as described above, on catalytic spots of about 100 nm diameter patterned by electron-beam lithography. These and other nanotubes were found to have lengths ranging from 2 to 10 m and diameters ranging from 30 to 200 nm, the exact values of length depending on growth times and conditions and the exact values of diameter depending on the diameters and thicknesses of the catalyst spots. The bottom part of Figure 2 is an SEM of an embedded array of carbon nanotubes after CMP.

Inkjet-based adaptive planarization (Conference Presentation)

NASA Astrophysics Data System (ADS)

Singhal, Shrawan; Grigas, Michelle M.; Khusnatdinov, Niyaz; Sreenivasan, Srinivasan V.

2017-03-01

Planarization is a critical unit step in the lithography process because it enables patterning of surfaces with versatile pattern density without compromising on the stringent planarity and depth-of-focus requirements. In addition to nanoscale pattern density variation, parasitics such as pre-existing wafer topography, can corrupt the desired process output after planarization. The topography of any surface can be classified in three broad categories, depending upon the amplitude and spatial wavelength of the same [1], [2]: (i) nominal shape, (ii) nanotopography and (iii) roughness. The nominal shape is given by the largest spatial wavelengths, typically < 20mm. For spatial length scales of 1-20mm, height variations at this spatial wavelength range are classified as nanotopography. Roughness usually has lower spatial wavelengths. While the nominal shape of a substrate surface is usually decided by the nature of wafer preparation and the tooling and chucking infrastructure used in the same, roughness is usually mitigated by standard polishing techniques. It is the intermediate nanotopography that is probably the most critical surface topography parameter. This is because most traditional polishing techniques cannot selectively address pre-existing substrate topography, without introducing a parasitic signature at the scale of nanotopography. Moreover, fields with pattern density variation typically also have length scales that are commensurate with nanotopography. It is thus instructive to summarize existing planarization technology to understand current limitations. Spin on Glass and Etch back is one technique used for micron scale device manufacturing [3]. As the name implies, a glass dielectric is spin-coated on the substrate followed by etching in a chemistry that ensures equal etching rates for both the sacrificial glass and the underlying film or substrate material. Photoresists may also be used instead of glass. However, the global planarity that can be achieved by this technique is limited. Also, planarization over a large isolated topographical feature has been studied for the reverse-tone Jet-and-Flash Imprint Lithography process, also known as JFIL-R [4]. This relies on surface tension and capillary effects to smoothen a spin-coated Si containing film that can be etched to obtain a smooth profile. To meet the stringent requirement of planarity in submicron device technologies Chemical Mechanical Planarization (CMP) is the most widely used planarization technology [5], [6]. It uses a combination of abrasive laden chemical slurry and a mechanical pad for achieving planar profiles. The biggest concern with CMP is the dependence of material removal rate on the pattern density of material, leading to the formation of a step between the high density and low-density. The step shows up as a long-range thickness variation in the planarized film, similar in scale to pre-existing substrate topography that should have been polished away. Preventive techniques like dummy fill and patterned resist can be used to reduce the variation in pattern density. These techniques increase the complexity of the planarization process and significantly limit the device design flexibility. Contact Planarization (CP) has also been reported as an alternative to the CMP processing [7], [8]. A substrate is spin coated with a photo curable material and pre baked to remove residual solvent. An ultra-flat surface or an optical flat is pressed on the spin-coated wafer. The material is forced to reflow. Pressure is used to spread out material evenly and achieve global planarization. The substrate is then exposed to UV radiation to harden the photo curable material. Although attractive, this process is not adaptive as it does not account for differences in surface topography of the wafer and the optical flat, nor can it address all the parasitics that arise during the process itself. The optical flat leads to undesirable planarization of even the substrate nominal shape and nanotopography, which corrupts the final film thickness profile. Hence, it becomes extremely difficult to eliminate this signature to a desirable extent without introducing other parasitic signatures. An example of this is shown in Figure 1. In this paper, a novel adaptive planarization process has been presented that potentially addresses the problems associated with planarization of varying pattern density, even in the presence of pre-existing substrate topography [9]. This process is called Inkjet-enabled Adaptive Planarization (IAP). The IAP process uses an inverse optimization scheme, built around a validated fluid mechanics-based forward model [10], that takes the pre-existing substrate topography and pattern layout as inputs. It then generates an inkjet drop pattern with a material distribution that is correlated with the desired planarization film profile. This allows a contiguous film to be formed with the desired thickness variation to cater to the topography and any parasitic signatures caused by the pattern layout. This film is formed by the coercing action of a compliant superstrate, which forces the drops to spread and merge and eliminates any bubble trapping. Then, the film is cured using blanket UV exposure and the superstrate separated to reveal the desired planarized film. The use of an inverse optimization algorithm allows substrate topography to be addressed adaptively. In other words, the algorithm can generate a drop pattern that does not disturb the pre-existing substrate topography substantially, but only caters to the pattern density variation. This process has potential advantages over other planarization techniques because of its adaptive nature. Hence, the IAP process can cater to substrates of varying topographies and pattern densities by changing the inkjetted material distribution, without any changes in hardware. The IAP process can also address pre-existing substrate topography selectively by conforming to the nominal shape while planarizing over the pattern layout. A schematic of the IAP process is shown in Figure 2. The goal of this paper is to present some preliminary results from the IAP process. A test pattern layout has been generated with the help of photolithography, and is shown in Figure 3. For the purpose of this trial, the nanoscale features have not been patterned, as it is expected that the planarization process will be blind to their presence. Thus, areas with nanoscale patterns have been patterned as a single feature of SiO2 with height equal to 100 nm. These features are adjacent to pattern-less areas, thus marking a drastic change in pattern density. As can be seen in Figure 4, the smallest length scale across which pattern density changes, is 70 microns. The goal of the IAP process is to be able to planarize this pattern with a film that conforms to pre-existing substrate topography. The targeted planarity of the film is 95% 3sigma, while the targeted film thickness at the tallest feature is less than 30 nm. In another trial, the inverse tone of the same layout will also be tested. This pattern has features of height equal to 100 nm where the previous pattern did not. The targeted metrics for the inverse layout are the same as the nominal layout.

Bioengineered 'golden' indica rice cultivars with beta-carotene metabolism in the endosperm with hygromycin and mannose selection systems.

PubMed

Datta, Karabi; Baisakh, Niranjan; Oliva, Norman; Torrizo, Lina; Abrigo, Editha; Tan, Jing; Rai, Mayank; Rehana, Sayda; Al-Babili, Salim; Beyer, Peter; Potrykus, Ingo; Datta, Swapan K

2003-03-01

Vitamin-A deficiency (VAD) is a major malnutrition problem in South Asia, where indica rice is the staple food. Indica-type rice varieties feed more than 2 billion people. Hence, we introduced a combination of transgenes using the biolistic system of transformation enabling biosynthesis of provitamin A in the endosperm of several indica rice cultivars adapted to diverse ecosystems of different countries. The rice seed-specific glutelin promoter (Gt-1 P) was used to drive the expression of phytoene synthase (psy), while lycopene beta-cyclase (lcy) and phytoene desaturase (crtI), fused to the transit peptide sequence of the pea-Rubisco small subunit, were driven by the constitutive cauliflower mosaic virus promoter (CaMV35S P). Transgenic plants were recovered through selection with either CaMV35S P driven hph (hygromycin phosphotransferase) gene or cestrum yellow leaf curling virus promoter (CMP) driven pmi (phophomannose isomerase) gene. Molecular and biochemical analyses demonstrated stable integration and expression of the transgenes. The yellow colour of the polished rice grain evidenced the carotenoid accumulation in the endosperm. The colour intensity correlated with the estimated carotenoid content by spectrophotometric and HPLC analysis. Carotenoid level in cooked polished seeds was comparable (with minor loss of xanthophylls) to that in non-cooked seeds of the same transgenic line. The variable segregation pattern in T1 selfing generation indicated single to multiple loci insertion of the transgenes in the genome. This is the first report of using nonantibiotic pmi driven by a novel promoter in generating transgenic indica rice for possible future use in human nutrition.

Interferometric analysis of polishing surface with a petal tool

NASA Astrophysics Data System (ADS)

Salas-Sánchez, Alfonso; Leal-Cabrera, Irce; Percino Zacarias, Elizabeth; Granados-Agustín, Fermín S.

2011-09-01

In this work, we describe a phase shift interferometric monitoring of polishing processes produced by a petal tool over a spherical surface to obtain a parabolic surface. In the process, we used a commercial polishing machine; the purpose of this work is to have control of polishing time. To achieve this analysis, we used a Fizeau interferometer of ZYGO Company for optical shop testing, and the Durango software from Diffraction International Company. For data acquisition, simulation and evaluation of optical surfaces, we start polishing process with a spherical surface with 15.46 cm of diameter; a 59.9 cm of radius curvature and, with f/# 1.9.

The clinical and occupational effectiveness of condition management for Incapacity Benefit recipients.

PubMed

Kellett, Stephen; Bickerstaffe, Darren; Purdie, Fiona; Dyke, Andrew; Filer, Sarah; Lomax, Victoria; Tomlinson, Hayley

2011-06-01

OBJECTIVES. The aim of the Condition Management Programme (CMP) is to help Incapacity Benefit recipients manage their health conditions more effectively and return to work. This paper seeks to examine the clinical and employment outcomes from a group-based and mixed-condition CMP. DESIGN. In a prospective cohort design, measures of employment status and psychological well-being were taken at three time points; pre-CMP, post-CMP, and at 3-month follow-up. METHOD. Participants (N= 2,064) with a variety of physical and mental health conditions voluntarily attended a seven session cognitive-behaviourally informed psychoeducational group intervention. The psychological measures used were the Clinical Outcomes in Routine Evaluation - Outcome Measure, Work and Social Adjustment Scale, Self-Efficacy Scale, and the Intrinsic Motivation Scale. The employment status of participants was also measured at the three time points of the evaluation. RESULTS. Following CMP, 50% of participants experienced a reliable improvement in psychological well-being and 26% had either taken some steps towards work or returned to work at follow-up. Participants with a mental health condition were more likely to experience a reliable improvement in psychological well-being compared to those with physical health conditions. CONCLUSIONS. The results suggest that participation in CMP may be helpful in facilitating more effective self-management of the health conditions contributing to unemployment. The results have implications for whether formal employment assistance should be available in mental health services. ©2010 The British Psychological Society.

Cerebral misery perfusion due to carotid occlusive disease

PubMed Central

Maddula, Mohana; Sprigg, Nikola; Bath, Philip M; Munshi, Sunil

2017-01-01

Purpose Cerebral misery perfusion (CMP) is a condition where cerebral autoregulatory capacity is exhausted, and cerebral blood supply in insufficient to meet metabolic demand. We present an educational review of this important condition, which has a range of clinical manifestations. Method A non-systematic review of published literature was undertaken on CMP and major cerebral artery occlusive disease, using Pubmed and Sciencedirect. Findings Patients with CMP may present with strokes in watershed territories, collapses and transient ischaemic attacks or episodic movements associated with an orthostatic component. While positron emission tomography is the gold standard investigation for misery perfusion, advanced MRI is being increasingly used as an alternative investigation modality. The presence of CMP increases the risk of strokes. In addition to the devastating effect of stroke, there is accumulating evidence of impaired cognition and quality of life with carotid occlusive disease (COD) and misery perfusion. The evidence for revascularisation in the setting of complete carotid occlusion is weak. Medical management constitutes careful blood pressure management while addressing other vascular risk factors. Discussion The evidence for the management of patients with COD and CMP is discussed, together with recommendations based on our local experience. In this review, we focus on misery perfusion due to COD. Conclusion Patients with CMP and COD may present with a wide-ranging clinical phenotype and therefore to many specialties. Early identification of patients with misery perfusion may allow appropriate management and focus on strategies to maintain or improve cerebral blood flow, while avoiding potentially harmful treatment. PMID:28959496

Does the grading of chondromalacia patellae influence anterior knee pain following total knee arthroplasty without patellar resurfacing?

PubMed

Zha, Guo-Chun; Feng, Shuo; Chen, Xiang-Yang; Guo, Kai-Jin

2018-03-01

The influence of chondromalacia patellae (CMP) on post-operative anterior knee pain (AKP) following total knee arthroplasty (TKA) remains controversial, and few studies have focused on the relationship between them. The purpose of this study was to determine whether different CMP grades affect the incidence of AKP after TKA without patellar resurfacing. We performed a retrospective analysis of prospectively collected data on 290 TKAs with the use of the low contact stress mobile-bearing prosthesis, without patellar resurfacing in 290 patients from February 2009 to January 2013. Patients were assessed by the Outerbridge classification for CMP, visual analog scale for AKP, the Knee Society clinical scoring system of knee score (KS), function score (FS), the patellar score (PS) for clinical function, and patients' satisfaction. The intra-operative grading of CMP: grade I in 30 patients, grade II in 68 patients, grade III in 97 patients, and grade IV in 95 patients. The incidence of AKP at 36-month follow-up was 10.3% (30/290). No statistical difference was detected among the different CMP grades in terms of the incidence of AKP (p = 0.995), patients' satisfaction (p = 0.832), KS (p = 0.228), FS (p = 0.713), and PS (p = 0.119) at 36-month follow-up. The findings may suggest no relevant influence of CMP grading on the incidence of AKP after TKA without patellar resurfacing.

Multilevel Dual Damascene copper interconnections

NASA Astrophysics Data System (ADS)

Lakshminarayanan, S.

Copper has been acknowledged as the interconnect material for future generations of ICs to overcome the bottlenecks on speed and reliability present with the current Al based wiring. A new set of challenges brought to the forefront when copper replaces aluminum, have to be met and resolved to make it a viable option. Unit step processes related to copper technology have been under development for the last few years. In this work, the application of copper as the interconnect material in multilevel structures with SiO2 as the interlevel dielectric has been explored, with emphasis on integration issues and complete process realization. Interconnect definition was achieved by the Dual Damascene approach using chemical mechanical polishing of oxide and copper. The choice of materials used as adhesion promoter/diffusion barrier included Ti, Ta and CVD TiN. Two different polish chemistries (NH4OH or HNO3 based) were used to form the interconnects. The diffusion barrier was removed during polishing (in the case of TiN) or by a post CMP etch (as with Ti or Ta). Copper surface passivation was performed using boron implantation and PECVD nitride encapsulation. The interlevel dielectric way composed of a multilayer stack of PECVD SiO2 and SixNy. A baseline process sequence which ensured the mechanical and thermal compatibility of the different unit steps was first created. A comprehensive test vehicle was designed and test structures were fabricated using the process flow developed. Suitable modifications were subsequently introduced in the sequence as and when processing problems were encountered. Electrical characterization was performed on the fabricated devices, interconnects, contacts and vias. The structures were subjected to thermal stressing to assess their stability and performance. The measurement of interconnect sheet resistances revealed lower copper loss due to dishing on samples polished using HNO3 based slurry. Interconnect resistances remained stable upto 400oC, 500oC and 600oC for Ti, TiN and Ta barriers respectively. Via resistivity on the order of 10-9/ /Omegacm2 was measured for Cu/Ta/Cu interfaces and no degradation in the via resistance was observed upto 600oC on the 2 μm and 3 μm wide contact windows. Characterization of diode leakage and subthreshold currents of CMOS transistors fabricated with Ta adhesion layers, showed the failure of the Ta barrier at 450oC. Despite the good barrier performance of the CVD TiN films, obtaining low contact resistivity may be a concern. The potential use of Cu-Mg alloy as the backend metallization has also been studied. Fully encapsulated wiring has been fabricated by causing the Mg to out- diffuse towards the Cu/SiO2 interfaces and the free copper surface. The inter-connects exhibited good stability and oxidation resistance, but via resistances were extremely high, probably due to the presence of insulating films like MgO or MgF2 at the interface between the two metal levels. It may be possible to decrease the via resistance to values comparable to Cu/Ta/Cu by altering the process flow and using a suitable via clean. When used at the contact level, undesirable interaction with the CoSi2 film was observed at temperatures as low as 350oC. Another problem was the high contact resistance at the Cu-Mg/CoSi2 interface. Hence the use of this alloy as a contact fill material is not feasible at this time. An additional barrier layer may be required between the Cu-Mg and CoSi2 films to protect the integrity of the silicide and provide low contact resistance.

Luminescence properties and energy transfer of site-sensitive Ca(6-x-y)Mg(x-z)(PO(4))(4):Eu(y)(2+),Mn(z)(2+) phosphors and their application to near-UV LED-based white LEDs.

PubMed

Kwon, Ki Hyuk; Im, Won Bin; Jang, Ho Seong; Yoo, Hyoung Sun; Jeon, Duk Young

2009-12-21

On the basis of the structural information that the host material has excellent charge stabilization, blue-emitting Ca(6-x-y)Mg(x)(PO(4))(4):Eu(y)(2+) (CMP:Eu(2+)) phosphors were synthesized and systematically optimized, and their photoluminescence (PL) properties were evaluated. Depending upon the amount of Mg added, the emission efficiency of the phosphors could be enhanced. The substitution of Eu(2+) affected their maximum wavelength (lambda(max)) and thermal stability because the substitution site of Eu(2+) could be varied. To obtain single-phase two-color-emitting phosphors, we incorporated Mn(2+) into CMP:Eu(2+) phosphors. Weak red emission resulting from the forbidden transition of Mn(2+) could be enhanced by the energy transfer from Eu(2+) to Mn(2+) that occurs because of the spectral overlap between the photoluminescence excitation (PLE) spectrum of Mn(2+) and the PL spectrum of Eu(2+). The energy transfer process was confirmed by the luminescence spectra, energy transfer efficiency, and decay curve of the phosphors. Finally, the optimized Ca(6-x-y)Mg(x-z)(PO(4))(4):Eu(y)(2+),Mn(z)(2+) (CMP:Eu(2+),Mn(2+)) phosphors were applied with green emitting Ca(2)MgSi(2)O(7):Eu(2+) (CMS:Eu(2+)) phosphors to ultraviolet (UV) light emitting diode (LED)-pumped white LEDs. The CMS:Eu(2+)-mixed CMP:Eu(2+), Mn(2+)-based white LEDs showed an excellent color rendering index (CRI) of 98 because of the broader emission band and more stable color coordinates than those of commercial Y(3)Al(5)O(12):Ce(3+) (YAG:Ce(3+))-based white LEDs under a forward bias current of 20 mA. The fabricated white LEDs showed very bright natural white light that had the color coordinate of (0.3288, 0.3401), and thus CMP:Eu(2+),Mn(2+) could be regarded as a good candidate for UV LED-based white LEDs.

Cytosine to uracil conversion through hydrolytic deamination of cytidine monophosphate hydroxy-alkylated on the amino group: a liquid chromatography--electrospray ionization--mass spectrometry investigation.

PubMed

Losito, I; Angelico, R; Introna, B; Ceglie, A; Palmisano, F

2012-10-01

A novel pathway for cytosine to uracil conversion performed in a micellar environment, leading to the generation of uridine monophosphate (UMP), was evidenced during the alkylation reaction of cytidine monophosphate (CMP) by dodecyl epoxide. Liquid chromatography-electrospray ionization - ion trap - mass spectrometry was used to separate and identify the reaction products and to follow their formation over time. The detection of hydroxy-amino-dodecane, concurrently with free UMP, in the reaction mixture suggested that, among the various alkyl-derivatives formed, CMP alkylated on the amino group of cytosine could undergo tautomerization to an imine and hydrolytic deamination, generating UMP. Interestingly, no evidence for this peculiar conversion pathway was obtained when guanosine monophosphate (GMP), the complementary ribonucleotide of CMP, was also present in the reaction mixture, due to the fact that NH(2)-alkylated CMP was not formed in this case. The last finding emphasized the role played by CMP-GMP molecular interactions, mediated by a micellar environment, in hindering the alkylation reaction at the level of the cytosine amino group. Copyright © 2012 John Wiley & Sons, Ltd.

Deoxypyrimidine monophosphate bypass therapy for thymidine kinase 2 deficiency

PubMed Central

Garone, Caterina; Garcia-Diaz, Beatriz; Emmanuele, Valentina; Lopez, Luis C; Tadesse, Saba; Akman, Hasan O; Tanji, Kurenai; Quinzii, Catarina M; Hirano, Michio

2014-01-01

Autosomal recessive mutations in the thymidine kinase 2 gene (TK2) cause mitochondrial DNA depletion, multiple deletions, or both due to loss of TK2 enzyme activity and ensuing unbalanced deoxynucleotide triphosphate (dNTP) pools. To bypass Tk2 deficiency, we administered deoxycytidine and deoxythymidine monophosphates (dCMP+dTMP) to the Tk2 H126N (Tk2−/−) knock-in mouse model from postnatal day 4, when mutant mice are phenotypically normal, but biochemically affected. Assessment of 13-day-old Tk2−/− mice treated with dCMP+dTMP 200 mg/kg/day each (Tk2−/−200dCMP/dTMP) demonstrated that in mutant animals, the compounds raise dTTP concentrations, increase levels of mtDNA, ameliorate defects of mitochondrial respiratory chain enzymes, and significantly prolong their lifespan (34 days with treatment versus 13 days untreated). A second trial of dCMP+dTMP each at 400 mg/kg/day showed even greater phenotypic and biochemical improvements. In conclusion, dCMP/dTMP supplementation is the first effective pharmacologic treatment for Tk2 deficiency. Subject Categories Genetics, Gene Therapy & Genetic Disease; Metabolism PMID:24968719

Deoxypyrimidine monophosphate bypass therapy for thymidine kinase 2 deficiency.

PubMed

Garone, Caterina; Garcia-Diaz, Beatriz; Emmanuele, Valentina; Lopez, Luis C; Tadesse, Saba; Akman, Hasan O; Tanji, Kurenai; Quinzii, Catarina M; Hirano, Michio

2014-08-01

Autosomal recessive mutations in the thymidine kinase 2 gene (TK2) cause mitochondrial DNA depletion, multiple deletions, or both due to loss of TK2 enzyme activity and ensuing unbalanced deoxynucleotide triphosphate (dNTP) pools. To bypass Tk2 deficiency, we administered deoxycytidine and deoxythymidine monophosphates (dCMP+dTMP) to the Tk2 H126N (Tk2(-/-)) knock-in mouse model from postnatal day 4, when mutant mice are phenotypically normal, but biochemically affected. Assessment of 13-day-old Tk2(-/-) mice treated with dCMP+dTMP 200 mg/kg/day each (Tk2(-/-200dCMP/) (dTMP)) demonstrated that in mutant animals, the compounds raise dTTP concentrations, increase levels of mtDNA, ameliorate defects of mitochondrial respiratory chain enzymes, and significantly prolong their lifespan (34 days with treatment versus 13 days untreated). A second trial of dCMP+dTMP each at 400 mg/kg/day showed even greater phenotypic and biochemical improvements. In conclusion, dCMP/dTMP supplementation is the first effective pharmacologic treatment for Tk2 deficiency. © 2014 The Authors. Published under the terms of the CC BY 4.0 license.

Circulating cell-derived microparticles in women with pregnancy loss.

PubMed

Alijotas-Reig, Jaume; Palacio-Garcia, Carles; Farran-Codina, Immaculada; Zarzoso, Cristina; Cabero-Roura, Luis; Vilardell-Tarres, Miquel

2011-09-01

To analyze cell-derived microparticles (cMP) in pregnancy loss (PL), both recurrent miscarriages (RM) and unexplained fetal loss (UFL). Non-matched case-control study was performed at Vall d'Hebron Hospital. Cell-derived microparticles of 53 PL cases, 30 with RM, 16 with UFL, and 7 (RM + UFL), were compared to 38 healthy pregnant women. Twenty healthy non-pregnant women act as controls. Cell-derived microparticles were analyzed through flow cytometry. Results are given as total annexin (A5+), endothelial-(CD144+/CD31+ CD41-), platelet-(CD41+), leukocyte-(CD45+) and CD41- c-MP/μL of plasma. Antiphospholipid antibodies (aPLA) were analyzed according to established methods. Comparing PL versus healthy pregnant, we observed a significant endothelial cMP decrease in PL. When comparing RM subgroup with controls, we observed significant decreases in endothelial cMP. When comparing the PL positive for aPLA versus PL-aPLA-negative, no cMP numbering differences were seen. Pregnancy loss seems to be related to endothelial cell activation and/or consumption. A relationship between aPLA and cMP could not be demonstrated. © 2011 John Wiley & Sons A/S.

Design Considerations of Polishing Lap for Computer-Controlled Cylindrical Polishing Process

NASA Technical Reports Server (NTRS)

Khan, Gufran S.; Gubarev, Mikhail; Speegle, Chet; Ramsey, Brian

2010-01-01

The future X-ray observatory missions, such as International X-ray Observatory, require grazing incidence replicated optics of extremely large collecting area (3 m2) in combination with angular resolution of less than 5 arcsec half-power diameter. The resolution of a mirror shell depends ultimately on the quality of the cylindrical mandrels from which they are being replicated. Mid-spatial-frequency axial figure error is a dominant contributor in the error budget of the mandrel. This paper presents our efforts to develop a deterministic cylindrical polishing process in order to keep the mid-spatial-frequency axial figure errors to a minimum. Simulation studies have been performed to optimize the operational parameters as well as the polishing lap configuration. Furthermore, depending upon the surface error profile, a model for localized polishing based on dwell time approach is developed. Using the inputs from the mathematical model, a mandrel, having conical approximated Wolter-1 geometry, has been polished on a newly developed computer-controlled cylindrical polishing machine. We report our first experimental results and discuss plans for further improvements in the polishing process.

Atmospheric oxidation of selected chlorinated alkenes by O3, OH, NO3 and Cl

NASA Astrophysics Data System (ADS)

Zhang, Qun; Chen, Yi; Tong, Shengrui; Ge, Maofa; Shenolikar, Justin; Johnson, Matthew S.; Wang, Yifeng; Tsona, Narcisse T.; Mellouki, Abdelwahid; Du, Lin

2017-12-01

An experimental study on the 3-chloro-2-methyl-1-propene (CMP), 2,3-dichloropropene (DCP) and 3,4-dichlorobutene (DCB) reactions with atmospheric oxidants at (298 ± 1) K and atmospheric pressure is reported. Rate constants for the gas phase reactions of the three chlorinated alkenes with O3, OH and NO3 radicals and Cl atom were determined in a 100 L Teflon reactor by gas chromatography with flame ionization detector (GC-FID). The obtained rate constants are (3.03 ± 0.15) × 10-18, (3.83 ± 1.30) × 10-11, (1.99 ± 0.19) × 10-14, and (2.40 ± 0.41) × 10-10 cm3 molecule-1 s-1 for CMP reactions with O3, OH, NO3, and Cl, respectively, (4.62 ± 1.41) × 10-20, (1.37 ± 1.02) × 10-11, (1.45 ± 0.15) × 10-15 and (1.30 ± 0.99) × 10-11 cm3 molecule-1 s-1 for DCP reactions and (2.09 ± 0.24) × 10-19, (1.45 ± 0.59) × 10-11, (3.00 ± 0.82) × 10-16 and (1.91 ± 0.19) × 10-10 cm3 molecule-1 s-1 for DCB reactions. The CMP reaction products were detected and possible reaction mechanisms of their formation were proposed. Chloroacetone was found to be the major product in all four oxidation reactions. The loss process of CMP in the atmosphere is mostly controlled by its reaction with the OH radical during daytime and with NO3 during nighttime, with lifetimes of 3.6 h and 27.9 h respectively. Atmospheric implications of both these reactions and their potential products are discussed.

Collaborative Platform for DFM

DTIC Science & Technology

2007-12-20

generation litho hotspot checkers have also been implemented in automated hotspot fixers that can automatically fix designs by making small changes...processing side (ex. new CMP models, etch models, litho models) and on the circuit side (ex. Process aware circuit analysis or yield optimization...Since final gate CD is a function of not only litho , but Post Exposure Bake, ashing, and etch, the processing module can be augmented with more

Improvement of magnetorheological finishing surface quality by nanoparticle jet polishing

NASA Astrophysics Data System (ADS)

Peng, Wenqiang; Li, Shengyi; Guan, Chaoliang; Shen, Xinmin; Dai, Yifan; Wang, Zhuo

2013-04-01

Nanoparticle jet polishing (NJP) is presented as a posttreatment to remove magnetorheological finishing (MRF) marks. In the NJP process the material is removed by chemical impact reaction, and the material removal rate of convex part is larger than that of the concave part. Smoothing thus can progress automatically in the NJP process. In the experiment, a silica glass sample polished by MRF was polished by NJP. Experiment results showed the MRF marks were removed clearly. The uniform polishing process shows that the NJP process can remove the MRF marks without destroying the original surface figure. The surface root-mean-square roughness is improved from 0.72 to 0.41 nm. power spectral density analysis indicates the surface quality is improved, and the experimental result validates effective removal of MRF marks by NJP.

Antifungal nanofibers made by controlled release of sea animal derived peptide

NASA Astrophysics Data System (ADS)

Viana, Juliane F. C.; Carrijo, Jéssica; Freitas, Camila G.; Paul, Arghya; Alcaraz, Jarib; Lacorte, Cristiano C.; Migliolo, Ludovico; Andrade, César A.; Falcão, Rosana; Santos, Nuno C.; Gonçalves, Sónia; Otero-González, Anselmo J.; Khademhosseini, Ali; Dias, Simoni C.; Franco, Octávio L.

2015-03-01

Candida albicans is a common human-pathogenic fungal species with the ability to cause several diseases including surface infections. Despite the clear difficulties of Candida control, antimicrobial peptides (AMPs) have emerged as an alternative strategy for fungal control. In this report, different concentrations of antifungal Cm-p1 (Cencritchis muricatus peptide 1) were electrospun into nanofibers for drug delivery. The nanofibers were characterized by mass spectrometry confirming the presence of the peptide on the scaffold. Atomic force microscopy and scanning electronic microscopy were used to measure the diameters, showing that Cm-p1 affects fiber morphology as well as the diameter and scaffold thickness. The Cm-p1 release behavior from the nanofibers demonstrated peptide release from 30 min to three days, leading to effective yeast control in the first 24 hours. Moreover, the biocompatibility of the fibers were evaluated through a MTS assay as well as ROS production by using a HUVEC model, showing that the fibers do not affect cell viability and only nanofibers containing 10% Cm-p1-PVA improved ROS generation. In addition, the secretion of pro-inflammatory cytokines IL-6 and TNF-α by the HUVECs was also slightly modified by the 10% Cm-p1-PVA nanofibers. In conclusion, the electrospinning technique applied here allowed for the manufacture of biodegradable biomimetic nanofibrous extracellular membranes with the ability to control fungal infection.Candida albicans is a common human-pathogenic fungal species with the ability to cause several diseases including surface infections. Despite the clear difficulties of Candida control, antimicrobial peptides (AMPs) have emerged as an alternative strategy for fungal control. In this report, different concentrations of antifungal Cm-p1 (Cencritchis muricatus peptide 1) were electrospun into nanofibers for drug delivery. The nanofibers were characterized by mass spectrometry confirming the presence of the peptide on the scaffold. Atomic force microscopy and scanning electronic microscopy were used to measure the diameters, showing that Cm-p1 affects fiber morphology as well as the diameter and scaffold thickness. The Cm-p1 release behavior from the nanofibers demonstrated peptide release from 30 min to three days, leading to effective yeast control in the first 24 hours. Moreover, the biocompatibility of the fibers were evaluated through a MTS assay as well as ROS production by using a HUVEC model, showing that the fibers do not affect cell viability and only nanofibers containing 10% Cm-p1-PVA improved ROS generation. In addition, the secretion of pro-inflammatory cytokines IL-6 and TNF-α by the HUVECs was also slightly modified by the 10% Cm-p1-PVA nanofibers. In conclusion, the electrospinning technique applied here allowed for the manufacture of biodegradable biomimetic nanofibrous extracellular membranes with the ability to control fungal infection. Electronic supplementary information (ESI) available. See DOI: 10.1039/c5nr00767d

Relationship between influence function accuracy and polishing quality in magnetorheological finishing

NASA Astrophysics Data System (ADS)

Schinhaerl, Markus; Schneider, Florian; Rascher, Rolf; Vogt, Christian; Sperber, Peter

2010-10-01

Magnetorheological finishing is a typical commercial application of a computer-controlled polishing process in the manufacturing of precision optical surfaces. Precise knowledge of the material removal characteristic of the polishing tool (influence function) is essential for controlling the material removal on the workpiece surface by the dwell time method. Results from the testing series with magnetorheological finishing have shown that a deviation of only 5% between the actual material removal characteristic of the polishing tool and that represented by the influence function caused a considerable reduction in the polishing quality. The paper discusses reasons for inaccuracies in the influence function and the effects on the polishing quality. The generic results of this research serve for the development of improved polishing strategies, and may be used in alternative applications of computer-controlled polishing processes that quantify the material removal characteristic by influence functions.

Random or predictable?: Adoption patterns of chronic care management practices in physician organizations.

PubMed

Miake-Lye, Isomi M; Chuang, Emmeline; Rodriguez, Hector P; Kominski, Gerald F; Yano, Elizabeth M; Shortell, Stephen M

2017-08-24

Theories, models, and frameworks used by implementation science, including Diffusion of Innovations, tend to focus on the adoption of one innovation, when often organizations may be facing multiple simultaneous adoption decisions. For instance, despite evidence that care management practices (CMPs) are helpful in managing chronic illness, there is still uneven adoption by physician organizations. This exploratory paper leverages this natural variation in uptake to describe inter-organizational patterns in adoption of CMPs and to better understand how adoption choices may be related to one another. We assessed a cross section of national survey data from physician organizations reporting on the use of 20 CMPs (5 each for asthma, congestive heart failure, depression, and diabetes). Item response theory was used to explore patterns in adoption, first considering all 20 CMPs together and then by subsets according to disease focus or CMP type (e.g., registries, patient reminders). Mokken scale analysis explored whether adoption choices were linked by disease focus or CMP type and whether a consistent ordering of adoption choices was present. The Mokken scale for all 20 CMPs demonstrated medium scalability (H = 0.43), but no consistent ordering. Scales for subsets of CMPs sharing a disease focus had medium scalability (0.4 < H < 0.5), while subsets sharing a CMP type had strong scalability (H > 0.5). Scales for CMP type consistently ranked diabetes CMPs as most adoptable and depression CMPs as least adoptable. Within disease focus scales, patient reminders were ranked as the most adoptable CMP, while clinician feedback and patient education were ranked the least adoptable. Patterns of adoption indicate that innovation characteristics may influence adoption. CMP dissemination efforts may be strengthened by encouraging traditionally non-adopting organizations to focus on more adoptable practices first and then describing a pathway for the adoption of subsequent CMPs. Clarifying why certain CMPs are "less adoptable" may also provide insights into how to overcome CMP adoption constraints.

Carboxymethyl pachyman (CMP) reduces intestinal mucositis and regulates the intestinal microflora in 5-fluorouracil-treated CT26 tumour-bearing mice.

PubMed

Wang, Canhong; Yang, Shuxian; Gao, Li; Wang, Lili; Cao, Li

2018-05-23

The compound 5-fluorouracil (5-FU) is the first choice chemotherapeutic agent for the treatment of colorectal cancer (CRC), but intestinal mucositis is a primary limiting factor in anticancer therapy. There is currently no broadly effective targeted treatment to cure this side effect. Carboxymethylated pachyman (CMP) is a polysaccharide that is modified from the structure of pachyman isolated from Poria cocos (Chinese name: Fu Ling). Meanwhile, recent studies have shown that CMP exhibits immune regulatory, anti-inflammatory and antioxidant activities. Therefore, the purpose of this study was to evaluate the intestinal protective effect of CMP in 5-FU-treated CT26 tumour-bearing mice and to further explore its underlying mechanism(s) of action. Initially, a CT26 colon carcinoma xenograft mice model was established. The colon length, colon tissue injury, intestinal flora, short-chain fatty acids (SCFAs) and indicators linked to inflammation, antioxidation and apoptosis were then measured. Our results showed that CMP in combination with 5-FU reversed intestinal shortening (p < 0.01) and alleviated 5-FU-induced colon injury (p < 0.001) via suppression of ROS production; increasing the levels of CAT, GSH-Px and GSH; decreasing expression of NF-κB, p-p38 and Bax; and elevating the levels of Nrf2 and Bcl-2. More importantly, CMP had a significant impact and counteracted the intestinal microflora disorders produced by 5-FU by increasing the proportion of Bacteroidetes, lactobacilli, and butyric acid-producing and acetic acid-producing bacteria and restoring the intestinal flora diversity. Overall, this work suggested that CMP could regulate the ecological balance of the intestinal flora and reduce colon injuries induced by 5-FU in CT26 tumour-bearing mice, and the mechanism involved may be associated with the regulation of the NF-κB, Nrf2-ARE and MAPK/P38 pathways.

Combined fabrication process for high-precision aspheric surface based on smoothing polishing and magnetorheological finishing

NASA Astrophysics Data System (ADS)

Nie, Xuqing; Li, Shengyi; Song, Ci; Hu, Hao

2014-08-01

Due to the different curvature everywhere, the aspheric surface is hard to achieve high-precision accuracy by the traditional polishing process. Controlling of the mid-spatial frequency errors (MSFR), in particular, is almost unapproachable. In this paper, the combined fabrication process based on the smoothing polishing (SP) and magnetorheological finishing (MRF) is proposed. The pressure distribution of the rigid polishing lap and semi-flexible polishing lap is calculated. The shape preserving capacity and smoothing effect are compared. The feasibility of smoothing aspheric surface with the semi-flexible polishing lap is verified, and the key technologies in the SP process are discussed. Then, A K4 parabolic surface with the diameter of 500mm is fabricated based on the combined fabrication process. A Φ150 mm semi-flexible lap is used in the SP process to control the MSFR, and the deterministic MRF process is applied to figure the surface error. The root mean square (RMS) error of the aspheric surface converges from 0.083λ (λ=632.8 nm) to 0.008λ. The power spectral density (PSD) result shows that the MSFR are well restrained while the surface error has a great convergence.

Conjugated Microporous Polymers for Heterogeneous Catalysis.

PubMed

Zhou, Yun-Bing; Zhan, Zhuang-Ping

2018-01-04

Conjugated microporous polymers (CMPs) are a class of crosslinked polymers that combine permanent micropores with π-conjugated skeletons and possess three-dimensional (3D) networks. Compared with conventional materials such as metal-organic frameworks (MOFs) and covalent organic frameworks (COFs), CMPs usually have superior chemical and thermal stability. CMPs have made significant progress in heterogeneous catalysis in the past seven years. With a bottom-up strategy, catalytic moieties can be directly introduced into in the framework to produce heterogeneous CMP catalysts. Higher activity, stability, and selectivity can be obtained with heterogeneous CMP catalysts in comparison with their homogeneous analogs. In addition, CMP catalysts can be easily isolated and recycled. In this review, we focus on CMPs as an intriguing platform for developing various highly efficient and recyclable heterogeneous catalysts in organic reactions. The design, synthesis, and structure of these CMP catalysts are also discussed in this focus review. © 2018 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

TreeCmp: Comparison of Trees in Polynomial Time

PubMed Central

Bogdanowicz, Damian; Giaro, Krzysztof; Wróbel, Borys

2012-01-01

When a phylogenetic reconstruction does not result in one tree but in several, tree metrics permit finding out how far the reconstructed trees are from one another. They also permit to assess the accuracy of a reconstruction if a true tree is known. TreeCmp implements eight metrics that can be calculated in polynomial time for arbitrary (not only bifurcating) trees: four for unrooted (Matching Split metric, which we have recently proposed, Robinson-Foulds, Path Difference, Quartet) and four for rooted trees (Matching Cluster, Robinson-Foulds cluster, Nodal Splitted and Triple). TreeCmp is the first implementation of Matching Split/Cluster metrics and the first efficient and convenient implementation of Nodal Splitted. It allows to compare relatively large trees. We provide an example of the application of TreeCmp to compare the accuracy of ten approaches to phylogenetic reconstruction with trees up to 5000 external nodes, using a measure of accuracy based on normalized similarity between trees.

The endolysins of bacteriophages CMP1 and CN77 are specific for the lysis of Clavibacter michiganensis strains.

PubMed

Wittmann, Johannes; Eichenlaub, Rudolf; Dreiseikelmann, Brigitte

2010-08-01

Putative endolysin genes of bacteriophages CMP1 and CN77, which infect Clavibacter michiganensis subsp. michiganensis and C. michiganensis subsp. nebraskensis, respectively, were cloned and expressed in Escherichia coli. The His-tagged endolysin of CMP1 consists of 306 amino acids and has a calculated molecular mass of 34.8 kDa, while the His-tagged endolysin of CN77 has 290 amino acids with a molecular mass of 31.9 kDa. The proteins were purified and their bacteriolytic activity was demonstrated. The bacteriolytic activity of both enzymes showed a host range which was limited to the respective C. michiganensis subspecies and did not affect other bacteria, even those closely related to Clavibacter. Due to the high specificity of the CMP1 and CN77 endolysins they may be useful tools for biocontrol of plant-pathogenic C. michiganensis without affecting other bacteria in the soil.

Power-Aware Compiler Controllable Chip Multiprocessor

NASA Astrophysics Data System (ADS)

Shikano, Hiroaki; Shirako, Jun; Wada, Yasutaka; Kimura, Keiji; Kasahara, Hironori

A power-aware compiler controllable chip multiprocessor (CMP) is presented and its performance and power consumption are evaluated with the optimally scheduled advanced multiprocessor (OSCAR) parallelizing compiler. The CMP is equipped with power control registers that change clock frequency and power supply voltage to functional units including processor cores, memories, and an interconnection network. The OSCAR compiler carries out coarse-grain task parallelization of programs and reduces power consumption using architectural power control support and the compiler's power saving scheme. The performance evaluation shows that MPEG-2 encoding on the proposed CMP with four CPUs results in 82.6% power reduction in real-time execution mode with a deadline constraint on its sequential execution time. Furthermore, MP3 encoding on a heterogeneous CMP with four CPUs and four accelerators results in 53.9% power reduction at 21.1-fold speed-up in performance against its sequential execution in the fastest execution mode.

Interaction of cytidine 5'-monophosphate with Au(111): an in situ infrared spectroscopic study.

PubMed

Doneux, Thomas; Fojt, Lukás

2009-07-13

The interaction of cytidine 5'-monophosphate (CMP) with gold surfaces is studied by means of in situ infrared spectroscopy and cyclic voltammetry at the Au(111)|aqueous solution interface. Similar to other nucleic acid components, cytidine 5'-monophosphate is chemisorbed on the surface at positive potentials, and the amount of adsorbed CMP increases with the potential. Subtractively normalized interfacial Fourier-transform infrared spectroscopy (SNIFTIRS) is used to identify the adsorbed and desorbed species. Upon electrochemical desorption, the molecules released in solution are unprotonated on the N3 atom. Striking similarities are found between the spectrum of adsorbed CMP and the solution spectrum of protonated CMP. The origin of such similarities is discussed. The results strongly suggest that chemisorption occurs through the N3 atom of the pyrimidine ring. A comparison is drawn with cytidine, whose electrochemical and spectroscopic behaviors are also investigated.

Ultrafast fingerprint indexing for embedded systems

NASA Astrophysics Data System (ADS)

Zhou, Ru; Sin, Sang Woo; Li, Dongju; Isshiki, Tsuyoshi; Kunieda, Hiroaki

2011-10-01

A novel core-based fingerprint indexing scheme for embedded systems is presented in this paper. Our approach is enabled by our new precise and fast core-detection algorithm with the direction map. It introduces the feature of CMP (core minutiae pair), which describes the coordinates of minutiae and the direction of ridges associated with the minutiae based on the uniquely defined core coordinates. Since each CMP is identical against the shift and rotation of the fingerprint image, the CMP comparison between a template and an input image can be performed without any alignment. The proposed indexing algorithm based on CMP is suitable for embedded systems because the tremendous speed up and the memory reduction are achieved. In fact, the experiments with the fingerprint database FVC2002 show that its speed for the identifications becomes about 40 times faster than conventional approaches, even though the database includes fingerprints with no core.

Multiwavelength digital holography for polishing tool shape measurement

NASA Astrophysics Data System (ADS)

Lédl, Vít.; Psota, Pavel; Václavík, Jan; Doleček, Roman; Vojtíšek, Petr

2013-09-01

Classical mechano-chemical polishing is still a valuable technique, which gives unbeatable results for some types of optical surfaces. For example, optics for high power lasers requires minimized subsurface damage, very high cosmetic quality, and low mid spatial frequency error. One can hardly achieve this with use of subaperture polishing. The shape of the polishing tool plays a crucial role in achieving the required form of the optical surface. Often the shape of the polishing tool or pad is not known precisely enough during the manufacturing process. The tool shape is usually premachined and later is changed during the polishing procedure. An experienced worker could estimate the shape of the tool indirectly from the shape of the polished element, and that is why he can achieve the required shape in few reasonably long iterative steps. Therefore the lack of the exact tool shape knowledge is tolerated. Sometimes, this indirect method is not feasible even if small parts are considered. Moreover, if processes on machines like planetary (continuous) polishers are considered, the incorrect shape of the polishing pad could extend the polishing times extremely. Every iteration step takes hours. Even worse, polished piece could be wasted if the pad has a poor shape. The ability of the tool shape determination would be very valuable in those types of lengthy processes. It was our primary motivation to develop a contactless measurement method for large diffusive surfaces and demonstrate its usability. The proposed method is based on application of multiwavelength digital holographic interferometry with phase shift.

A new polishing process for large-aperture and high-precision aspheric surface

NASA Astrophysics Data System (ADS)

Nie, Xuqing; Li, Shengyi; Dai, Yifan; Song, Ci

2013-07-01

The high-precision aspheric surface is hard to be achieved due to the mid-spatial frequency error in the finishing step. The influence of mid-spatial frequency error is studied through the simulations and experiments. In this paper, a new polishing process based on magnetorheological finishing (MRF), smooth polishing (SP) and ion beam figuring (IBF) is proposed. A 400mm aperture parabolic surface is polished with this new process. The smooth polishing (SP) is applied after rough machining to control the MSF error. In the middle finishing step, most of low-spatial frequency error is removed by MRF rapidly, then the mid-spatial frequency error is restricted by SP, finally ion beam figuring is used to finish the surface. The surface accuracy is improved from the initial 37.691nm (rms, 95% aperture) to the final 4.195nm. The results show that the new polishing process is effective to manufacture large-aperture and high-precision aspheric surface.

Center removal amount control of magnetorheological finishing process by spiral polishing way

NASA Astrophysics Data System (ADS)

Wang, Yajun; He, Jianguo; Ji, Fang; Huang, Wen; Xiao, Hong; Luo, Qing; Zheng, Yongcheng

2010-10-01

Spiral polishing is a traditional process of computer-controlled optical surfacing. However, the additional polishing amount is great and the center polishing amount is difficult to control. At first, a simplified mathematics model is presented for magnetorheological finishing, which indicates that the center polishing amount and additional polishing amount are proportional to the length and peak value of magnetorheological finishing influence function, and are inversely proportional to pitch and rotation rate of spiral track, and the center polishing amount is much bigger than average polishing amount. Secondly, the relationships of "tool feed way and center polishing amount", "spiral pitch and calculation accuracy of influence matrix for dwell time function solution", "spiral pitch and center polishing amount" and "peak removal rate, dimensions of removal function and center removal amount" are studied by numerical computation by Archimedes spiral path. It shows that the center polishing amount is much bigger in feed stage than that in backhaul stage when the head of influence function is towards workpiece edge in feeding; and the bigger pitch, the bigger calculation error of influence matrix elements; and the bigger pitch, the smaller center polishing amount, and the smaller peak removal rate and dimensions of removal function, the smaller center removal amount. At last, the polishing results are given, which indicates that the center polishing amount is acceptable with a suitable polishing amount rate of feed stage and backhaul stage, and with a suitable spiral pitch during magnetorheological finishing procedure by spiral motion way.

The Effect of Postpartum Depression and Current Mental Health Problems of the Mother on Child Behaviour at Eight Years.

PubMed

Closa-Monasterolo, R; Gispert-Llaurado, M; Canals, J; Luque, V; Zaragoza-Jordana, M; Koletzko, B; Grote, V; Weber, M; Gruszfeld, D; Szott, K; Verduci, E; ReDionigi, A; Hoyos, J; Brasselle, G; Escribano Subías, J

2017-07-01

Background Maternal postpartum depression (PPD) could affect children's emotional development, increasing later risk of child psychological problems. The aim of our study was to assess the association between child's emotional and behavioural problems and mother's PPD, considering maternal current mental health problems (CMP). Methods This is a secondary analysis from the EU-Childhood Obesity Project (NCT00338689). Women completed the Edinburgh Postnatal Depression Scale (EPDS) at, 2, 3 and 6 months after delivery and the General Health Questionnaire (GHQ-12) to assess CMP once the children reached the age of 8 years. EPDS scores > 10 were defined as PPD and GHQ-12 scores > 2 were defined as CMP. The psychological problems of the children at the age of eight were collected by mothers through the Child's Behaviour Checklist (CBCL). Results 473, 474 and 459 mothers filled in GHQ-12 and CBCL tests at 8 years and EPDS at 2, 3 and 6 months, respectively. Anxiety and depression was significantly increased by maternal EPDS. Children whose mothers had both PPD and CMP exhibited the highest levels of psychological problems, followed by those whose mothers who had only CMP and only PPD. PPD and CMP had a significant effect on child's total psychological problems (p = 0.033, p < 0.001, respectively). Children whose mothers had PPD did not differ from children whose mothers did not have any depression. Conclusions Maternal postpartum depression and current mental health problems, separately and synergistically, increase children's psychological problems at 8 years.

Development of Rapid, Continuous Calibration Techniques and Implementation as a Prototype System for Civil Engineering Materials Evaluation

NASA Astrophysics Data System (ADS)

Scott, M. L.; Gagarin, N.; Mekemson, J. R.; Chintakunta, S. R.

2011-06-01

Until recently, civil engineering material calibration data could only be obtained from material sample cores or via time consuming, stationary calibration measurements in a limited number of locations. Calibration data are used to determine material propagation velocities of electromagnetic waves in test materials for use in layer thickness measurements and subsurface imaging. Limitations these calibration methods impose have been a significant impediment to broader use of nondestructive evaluation methods such as ground-penetrating radar (GPR). In 2006, a new rapid, continuous calibration approach was designed using simulation software to address these measurement limitations during a Federal Highway Administration (FHWA) research and development effort. This continuous calibration method combines a digitally-synthesized step-frequency (SF)-GPR array and a data collection protocol sequence for the common midpoint (CMP) method. Modeling and laboratory test results for various data collection protocols and materials are presented in this paper. The continuous-CMP concept was finally implemented for FHWA in a prototype demonstration system called the Advanced Pavement Evaluation (APE) system in 2009. Data from the continuous-CMP protocol is processed using a semblance/coherency analysis to determine material propagation velocities. Continuously calibrated pavement thicknesses measured with the APE system in 2009 are presented. This method is efficient, accurate, and cost-effective.

Quality of ω-3 fatty acid enriched low-fat chicken meat patties incorporated with selected levels of linseed flour/oil and canola flour/oil.

PubMed

Singh, Ripudaman; Chatli, Manish K; Biswas, Ashim K; Sahoo, Jhari

2014-02-01

The aim of the present study was to compare the nutritional, processing and sensory characteristics of low-fat ω-3 enriched fatty acids chicken meat patties (CMP) prepared with the incorporation of 4% linseed flour (T1), 2% canola flour (T2), 3% linseed oil (T3), and 4% canola oil (T4) and to estimate their cost of production. The total fat and crude fiber content was increased (P < 0.05) with the incorporation of linseed flour. The emulsion stability and cooking yield was greater (P < 0.05) in T4 among all the treatments. The percent shrinkage was lower (P < 0.05) in linseed/canola oil incorporated CMP than their respective flours. The colour and appearance and flavour scores were lower (P < 0.05) in canola flour than canola oil incorporated CMP. The texture scores were not influenced (P < 0.05) in linseed-and canola-treated products. The overall acceptability was greatest (P < 0.05) in T4 whereas, lowest (P < 0.05) in T2 among all treated products. The cost of production was increased by 3-5% with the incorporation of linseed and canola oil whereas it was almost same for control and linseed flour.

Synergetic effect of chelating agent and nonionic surfactant for benzotriazole removal on post Cu-CMP cleaning

NASA Astrophysics Data System (ADS)

Yanlei, Li; Yuling, Liu; Chenwei, Wang; Yue, Li

2016-08-01

The cleaning of copper interconnects after chemical mechanical planarization (CMP) process is a critical step in integrated circuits (ICs) fabrication. Benzotriazole (BTA), which is used as corrosion inhibitor in the copper CMP slurry, is the primary source for the formation of organic contaminants. The presence of BTA can degrade the electrical properties and reliability of ICs which needs to be removed by using an effective cleaning solution. In this paper, an alkaline cleaning solution was proposed. The alkaline cleaning solution studied in this work consists of a chelating agent and a nonionic surfactant. The removal of BTA was characterized by contact angle measurements and potentiodynamic polarization studies. The cleaning properties of the proposed cleaning solution on a 300 mm copper patterned wafer were also quantified, total defect counts after cleaning was studied, scanning electron microscopy (SEM) review was used to identify types of BTA to confirm the ability of cleaning solution for BTA removal. All the results reveal that the chelating agent can effectively remove the BTA residual, nonionic surfactant can further improve the performance. Project supported by the Natural Science Foundation of Hebei Province, China (No. F2015202267) and the Scientific Innovation Grant for Excellent Young Scientists of Hebei University of Technology (No. 2015007).

Development of rapid, continuous calibration techniques and implementation as a prototype system for civil engineering materials evaluation

DOE Office of Scientific and Technical Information (OSTI.GOV)

Scott, M. L.; Gagarin, N.; Mekemson, J. R.

Until recently, civil engineering material calibration data could only be obtained from material sample cores or via time consuming, stationary calibration measurements in a limited number of locations. Calibration data are used to determine material propagation velocities of electromagnetic waves in test materials for use in layer thickness measurements and subsurface imaging. Limitations these calibration methods impose have been a significant impediment to broader use of nondestructive evaluation methods such as ground-penetrating radar (GPR). In 2006, a new rapid, continuous calibration approach was designed using simulation software to address these measurement limitations during a Federal Highway Administration (FHWA) research andmore » development effort. This continuous calibration method combines a digitally-synthesized step-frequency (SF)-GPR array and a data collection protocol sequence for the common midpoint (CMP) method. Modeling and laboratory test results for various data collection protocols and materials are presented in this paper. The continuous-CMP concept was finally implemented for FHWA in a prototype demonstration system called the Advanced Pavement Evaluation (APE) system in 2009. Data from the continuous-CMP protocol is processed using a semblance/coherency analysis to determine material propagation velocities. Continuously calibrated pavement thicknesses measured with the APE system in 2009 are presented. This method is efficient, accurate, and cost-effective.« less

Fabrication of ф 160 mm convex hyperbolic mirror for remote sensing instrument

NASA Astrophysics Data System (ADS)

Kuo, Ching-Hsiang; Yu, Zong-Ru; Ho, Cheng-Fang; Hsu, Wei-Yao; Chen, Fong-Zhi

2012-10-01

In this study, efficient polishing processes with inspection procedures for a large convex hyperbolic mirror of Cassegrain optical system are presented. The polishing process combines the techniques of conventional lapping and CNC polishing. We apply the conventional spherical lapping process to quickly remove the sub-surface damage (SSD) layer caused by grinding process and to get the accurate radius of best-fit sphere (BFS) of aspheric surface with fine surface texture simultaneously. Thus the removed material for aspherization process can be minimized and the polishing time for SSD removal can also be reduced substantially. The inspection procedure was carried out by using phase shift interferometer with CGH and stitching technique. To acquire the real surface form error of each sub aperture, the wavefront errors of the reference flat and CGH flat due to gravity effect of the vertical setup are calibrated in advance. Subsequently, we stitch 10 calibrated sub-aperture surface form errors to establish the whole irregularity of the mirror in 160 mm diameter for correction polishing. The final result of the In this study, efficient polishing processes with inspection procedures for a large convex hyperbolic mirror of Cassegrain optical system are presented. The polishing process combines the techniques of conventional lapping and CNC polishing. We apply the conventional spherical lapping process to quickly remove the sub-surface damage (SSD) layer caused by grinding process and to get the accurate radius of best-fit sphere (BFS) of aspheric surface with fine surface texture simultaneously. Thus the removed material for aspherization process can be minimized and the polishing time for SSD removal can also be reduced substantially. The inspection procedure was carried out by using phase shift interferometer with CGH and stitching technique. To acquire the real surface form error of each sub aperture, the wavefront errors of the reference flat and CGH flat due to gravity effect of the vertical setup are calibrated in advance. Subsequently, we stitch 10 calibrated sub-aperture surface form errors to establish the whole irregularity of the mirror in 160 mm diameter for correction polishing. The final result of the Fabrication of ф160 mm Convex Hyperbolic Mirror for Remote Sensing Instrument160 mm convex hyperbolic mirror is 0.15 μm PV and 17.9 nm RMS.160 mm convex hyperbolic mirror is 0.15 μm PV and 17.9 nm RMS.

New perspectives in hydrodynamic radial polishing techniques for optical surfaces

NASA Astrophysics Data System (ADS)

Ruiz, Elfego; Sohn, Erika; Luna, Esteban; Salas, Luis; Cordero, Alberto; González, Jorge; Núñez, Manuel; Salinas, Javier; Cruz-González, Irene; Valdés, Jorge; Cabrera, Victor; Martínez, Benjamín

2004-09-01

In order to overcome classic polishing techniques, a novel hydrodynamic radial polishing tool (HyDRa) is presented; it is useful for the corrective lapping and fine polishing of diverse materials by means of a low-cost abrasive flux and a hydrostatic suspension system that avoids contact of the tool with the working surface. This tool enables the work on flat or curved surfaces of currently up to two and a half meters in diameter. It has the advantage of avoiding fallen edges during the polishing process as well as reducing tool wear out and deformation. The functioning principle is based on the generation of a high-velocity, high-pressure, abrasive emulsion flux with radial geometry. The polishing process is repeatable by means of the control of the tool operational parameters, achieving high degrees of precision and accuracy on optical and semiconductor surfaces, with removal rates of up to 9 mm3/hour and promising excellent surface polishing qualities. An additional advantage of this new tool is the possibility to perform interferometric measurements during the polishing process without the need of dismounting the working surface. A series of advantages of this method, numerical simulations and experimental results are described.

Deoxycytidine and deoxythymidine treatment for thymidine kinase 2 deficiency

PubMed Central

Lopez-Gomez, Carlos; Levy, Rebecca J; Sanchez-Quintero, Maria J; Juanola-Falgarona, Marti; Barca, Emanuele; Garcia-Diaz, Beatriz; Tadesse, Saba; Garone, Caterina; Hirano, Michio

2017-01-01

Objective Thymidine kinase 2 (TK2), a critical enzyme in the mitochondrial pyrimidine salvage pathway, is essential for mitochondrial DNA (mtDNA) maintenance. Mutations in the nuclear gene TK2 cause TK2 deficiency, which manifests predominantly in children as myopathy with mtDNA depletion. Molecular bypass therapy with the TK2 products, dCMP and dTMP, prolongs the lifespan of Tk2-deficient (Tk2-/-) mice by 2-3 fold. Because we observed rapid catabolism of the deoxynucleoside monophosphates to deoxythymidine (dT) and deoxycytidine (dC), we hypothesized that: 1) deoxynucleosides might be the major active agents and 2) inhibition of deoxycytidine deamination might enhance dTMP+dCMP therapy. Methods To test these hypotheses, we assessed two therapies in Tk2-/- mice: 1) dT+dC and 2) co-administration of the deaminase inhibitor, tetrahydrouridine (THU), with dTMP+dCMP. Results We observed that dC+dT delayed disease onset, prolonged lifespan of Tk2-deficient mice, and restored mtDNA copy number as well as respiratory chain enzyme activities and levels. In contrast, dCMP+dTMP+THU therapy decreased lifespan of Tk2-/- animals compared to dCMP+dTMP. Interpretation Our studies demonstrate that deoxynucleoside substrate enhancement is a novel therapy, which may ameliorate TK2 deficiency in patients. PMID:28318037

Creating a Community to Strengthen the Broader Impacts of Condensed Matter Physics Research

NASA Astrophysics Data System (ADS)

Adenwalla, Shireen; Bosley, Jocelyn; Voth, Gregory; Smith, Leigh

The Broader Impacts (BI) merit criteria set out by the National Science Foundation are essential for building the public support necessary for science to flourish. Condensed matter physicists (CMP) have made transformative impacts on our society, but these are often invisible to the public. Communicating the societal benefits of our research can be challenging, because CMP consists of many independent research groups for whom effective engagement in the public arena is not necessarily a forte. Other BI activities, such as engaging K-12 students and teachers to increase scientific literacy and strengthen the STEM workforce, may be very effective, but these are often isolated and short in duration. To increase the visibility of CMP and to make the implementation of BI activities more efficient, we have created a website with two sides: a public side to communicate to a broad audience exciting scientific discoveries in CMP and the technologies they enable, and a private side for condensed matter researchers to communicate with one another about effective broader impact activities. Here we discuss the content of the new website, and the best practices we have identified for communicating the excitement of CMP research to the broadest possible audience. Nsf-DMR 1550737, 1550724 and 1550681.

Laser polishing of additive manufactured Ti alloys

NASA Astrophysics Data System (ADS)

Ma, C. P.; Guan, Y. C.; Zhou, W.

2017-06-01

Laser-based additive manufacturing has attracted much attention as a promising 3D printing method for metallic components in recent years. However, surface roughness of additive manufactured components has been considered as a challenge to achieve high performance. In this work, we demonstrate the capability of fiber laser in polishing rough surface of additive manufactured Ti-based alloys as Ti-6Al-4V and TC11. Both as-received surface and laser-polished surfaces as well as cross-section subsurfaces were analyzed carefully by White-Light Interference, Confocal Microscope, Focus Ion Beam, Scanning Electron Microscopy, Energy Dispersive Spectrometer, and X-ray Diffraction. Results revealed that as-received Ti-based alloys with surface roughness more than 5 μm could be reduce to less than 1 μm through laser polishing process. Moreover, microstructure, microhardness and wear resistance of laser-polished zone was investigated in order to examine the thermal effect of laser polishing processing on the substrate of additive manufactured Ti alloys. This proof-of-concept process has the potential to effectively improve the surface roughness of additive manufactured metallic alloy by local polishing method without damage to the substrate.

Total circulating microparticle levels are increased in patients with deep infiltrating endometriosis.

PubMed

Munrós, J; Martínez-Zamora, M A; Tàssies, D; Coloma, J L; Torrente, M A; Reverter, J C; Carmona, F; Balasch, J

2017-02-01

Are the levels of total circulating cell-derived microparticles (cMPs) and circulating tissue factor-containing microparticles (cMP-TF) increased in patients with endometriosis? The levels of total cMP, but not cMP-TF, were higher in patients with endometriosis, and these were attributed to higher levels in patients with deep infiltrating endometriosis (DIE). Previous studies have reported elevated levels of total cMP in inflammatory conditions as well as higher levels of other inflammatory biomarkers in endometriosis. Increased expression of tissue factor (a transmembrane receptor for Factor VII/VIIa) in eutopic and ectopic endometrium from patients with endometriosis has been described. There is no previous data regarding total cMP and cMP-TF levels in patients with endometriosis. A prospective case-control study including two groups of patients was carried out. The E group included 65 patients with surgically confirmed endometriosis (37 with DIE lesions) and the C group comprises 33 women without surgical findings of any form of endometriosis. Patients and controls were recruited during the same 10-month period. Controls were the next patient without endometriosis undergoing surgery, after including two patients with endometriosis. Venous blood samples for total cMP and cMP-TF determinations were obtained at the time of surgery, before anesthesia at a tertiary care center. To assess total cMP, an ELISA functional assay was used and cMP-TF activity in plasma was measured using an ELISA kit. Total cMP levels in plasma were higher in the E group compared with the C group (P < 0.0001). The subanalysis of endometriosis patients with DIE or with ovarian endometriomas without DIE showed that total cMP levels were higher in the DIE group (P = 0.001). There were no statistically significant differences in cMP-TF levels among the groups analyzed. This is a preliminary study in which the sample size was arbitrarily decided, albeit in keeping with previous studies analyzing cMP in other inflammatory diseases and other biomarkers in endometriosis. The control group included patients with other pathologies as well as healthy controls, and blood samples were taken at different phases of the cycle. Elevated total cMP levels in DIE patients may reflect an inflammatory and/or procoagulant systemic status in these patients. Further studies are warranted to confirm our findings and to assess the role of cMP levels in the pathophysiology of DIE. This study was supported in part by a grant from FIS-PI11/01560 and FIS-PI11/00977 within the 'Plan Nacional de I + D + I' and co-funded by the 'ISCIII-Subdirección General de Evaluación' and 'Fondo Europeo de Desarrollo Regional (FEDER)' and by the grant 'Premi Fi de Residència Emili Letang 2015' from the Hospital Clínic of Barcelona. The authors have no competing interests to disclose. © The Author 2016. Published by Oxford University Press on behalf of the European Society of Human Reproduction and Embryology. All rights reserved. For Permissions, please email: journals.permissions@oup.com.

Investigation of the Relationship between Anterior Knee Pain and Chondromalacia Patellae and Patellofemoral Malalignment.

PubMed

Aysin, Idil Kurut; Askin, Ayhan; Mete, Berna Dirim; Guvendi, Ece; Aysin, Murat; Kocyigit, Hikmet

2018-02-01

The study aimed to investigate whether there is any association of anterior knee pain and knee function with chondromalacia stage and patellofemoral alignment in patients with anterior knee pain for over a month and with chondromalacia patellae (CMP) detected by magnetic resonance imaging (MRI). We reviewed the medical records of 38 patients who underwent a knee MRI examination and were diagnosed with chondromalacia based on the MRI. Knee MRI images were evaluated by a radiologist for chondromalacia staging. Patients were divided into two groups as early stage (stage 1-2) and advanced stage (stage 3-4) chondromalacia. Patients' demographical data (age, sex, and occupation), clinical features, physical examination findings and patellofemoral pain severity scale, kujala patellofemoral scoring system, and functional index questionnaire scores were obtained from their medical records. Trochlear sulcus angle, sulcus depth, lateral patellofemoral angle, patellar translation, and Insall-Salvati index were measured using the MRI images. The mean patient age was higher in the advanced stage CMP group compared to the early stage CMP group (p=0.038). There was no statistically significant difference regarding other demographical data (p>0.05). MRI measurement parameters did not show difference between the groups (p>0.05). Patients in the advanced stage CMP group had higher patellofemoral pain severity score, lower kujala patellofemoral score, and lower functional index questionnaire score compared to the early stage CMP group. The differences were statistically significant (p=0.008, p=0.012, and p=0.026, respectively). As chondromalacia stage advances, the symptom severity worsens and knee functions decline; however, MRI measurements do not show difference between early and advanced stage CMP patients.

Investigation of the Relationship between Anterior Knee Pain and Chondromalacia Patellae and Patellofemoral Malalignment

PubMed Central

Aysin, Idil Kurut; Askin, Ayhan; Mete, Berna Dirim; Guvendi, Ece; Aysin, Murat; Kocyigit, Hikmet

2018-01-01

Objective: The study aimed to investigate whether there is any association of anterior knee pain and knee function with chondromalacia stage and patellofemoral alignment in patients with anterior knee pain for over a month and with chondromalacia patellae (CMP) detected by magnetic resonance imaging (MRI). Materials and Methods: We reviewed the medical records of 38 patients who underwent a knee MRI examination and were diagnosed with chondromalacia based on the MRI. Knee MRI images were evaluated by a radiologist for chondromalacia staging. Patients were divided into two groups as early stage (stage 1–2) and advanced stage (stage 3–4) chondromalacia. Patients’ demographical data (age, sex, and occupation), clinical features, physical examination findings and patellofemoral pain severity scale, kujala patellofemoral scoring system, and functional index questionnaire scores were obtained from their medical records. Trochlear sulcus angle, sulcus depth, lateral patellofemoral angle, patellar translation, and Insall–Salvati index were measured using the MRI images. Results: The mean patient age was higher in the advanced stage CMP group compared to the early stage CMP group (p=0.038). There was no statistically significant difference regarding other demographical data (p>0.05). MRI measurement parameters did not show difference between the groups (p>0.05). Patients in the advanced stage CMP group had higher patellofemoral pain severity score, lower kujala patellofemoral score, and lower functional index questionnaire score compared to the early stage CMP group. The differences were statistically significant (p=0.008, p=0.012, and p=0.026, respectively). Conclusion: As chondromalacia stage advances, the symptom severity worsens and knee functions decline; however, MRI measurements do not show difference between early and advanced stage CMP patients. PMID:29531488

Ready-to-use pre-filled syringes of atropine for anaesthesia care in French hospitals - a budget impact analysis.

PubMed

Benhamou, Dan; Piriou, Vincent; De Vaumas, Cyrille; Albaladejo, Pierre; Malinovsky, Jean-Marc; Doz, Marianne; Lafuma, Antoine; Bouaziz, Hervé

2017-04-01

Patient safety is improved by the use of labelled, ready-to-use, pre-filled syringes (PFS) when compared to conventional methods of syringe preparation (CMP) of the same product from an ampoule. However, the PFS presentation costs more than the CMP presentation. To estimate the budget impact for French hospitals of switching from atropine in ampoules to atropine PFS for anaesthesia care. A model was constructed to simulate the financial consequences of the use of atropine PFS in operating theatres, taking into account wastage and medication errors. The model tested different scenarios and a sensitivity analysis was performed. In a reference scenario, the systematic use of atropine PFS rather than atropine CMP yielded a net one-year budget saving of €5,255,304. Medication errors outweighed other cost factors relating to the use of atropine CMP (€9,425,448). Avoidance of wastage in the case of atropine CMP (prepared and unused) was a major source of savings (€1,167,323). Significant savings were made by means of other scenarios examined. The sensitivity analysis suggests that the results obtained are robust and stable for a range of parameter estimates and assumptions. The financial model was based on data obtained from the literature and expert opinions. The budget impact analysis shows that even though atropine PFS is more expensive than atropine CMP, its use would lead to significant cost savings. Savings would mainly be due to fewer medication errors and their associated consequences and the absence of wastage when atropine syringes are prepared in advance. Copyright © 2016 Société française d'anesthésie et de réanimation (Sfar). Published by Elsevier Masson SAS. All rights reserved.

Information Competencies and Their Implementation in the Educational Process of Polish Universities Exploratory Studies

ERIC Educational Resources Information Center

Tonakiewicz-Kolosowska, Anna; Socik, Iwona; Gajewska, Monika

2016-01-01

The authors present the development and perspectives of improving the quality of Information Literacy programmes in Polish technical universities, considering the Bologna Process and the general conditions of the Polish higher education system. The survey conducted in selected technical and medical universities provided an overview of changes…

Nd:YOV4 laser polishing on WC-Co HVOF coating

NASA Astrophysics Data System (ADS)

Giorleo, L.; Ceretti, E.; Montesano, L.; La Vecchia, G. M.

2017-10-01

WC/Co coatings are widely applied to different types of components due to their extraordinary performance properties including high hardness and wear properties. In industrial applications High Velocity Oxy-Fuel (HVOF) technique is extensively used to deposit hard metal coatings. The main advantage of HVOF compared to other thermal spray techniques is the ability to accelerate the melted powder particles of the feedstock material at a relatively high velocity, leading to obtain good adhesion and low porosity level. However, despite the mentioned benefits, the surface finish quality of WC-Co HVOF coatings results to be poor (Ra higher than 5 µm) thus a mechanical polishing process is often needed. The main problem is that the high hardness of coating leads the polishing process expensive in terms of time and tool wear; moreover polishing becomes difficult and not always possible in case of limited accessibility of a part, micro dimensions or undercuts. Nowadays a different technique available to improve surface roughness is the laser polishing process. The polishing principle is based on focused radiation of a laser beam that melts a microscopic layer of surface material. Compared to conventional polishing process (as grinding) it ensures the possibility of avoiding tool wear, less pollution (no abrasive or liquids), no debris, less machining time and coupled with a galvo system it results to be more suitable in case of 3D complex workpieces. In this paper laser polishing process executed with a Nd:YOV4 Laser was investigated: the effect of different process parameters as initial coating morphology, laser scan speed and loop cycles were tested. Results were compared by a statistical approach in terms of average roughness along with a morphological analysis carried out by Scanning Electron Microscope (SEM) investigation coupled with EDS spectra.

Cycle time and cost reduction in large-size optics production

NASA Astrophysics Data System (ADS)

Hallock, Bob; Shorey, Aric; Courtney, Tom

2005-09-01

Optical fabrication process steps have remained largely unchanged for decades. Raw glass blanks have been rough-machined, generated to near net shape, loose abrasive or fine bound diamond ground and then polished. This set of processes is sequential and each subsequent operation removes the damage and micro cracking induced by the prior operational step. One of the long-lead aspects of this process has been the glass polishing. Primarily, this has been driven by the need to remove relatively large volumes of glass material compared to the polishing removal rate to ensure complete damage removal. The secondary time driver has been poor convergence to final figure and the corresponding polish-metrology cycles. The overall cycle time and resultant cost due to labor, equipment utilization and shop efficiency is increased, often significantly, when the optical prescription is aspheric. In addition to the long polishing cycle times, the duration of the polishing time is often very difficult to predict given that current polishing processes are not deterministic processes. This paper will describe a novel approach to large optics finishing, relying on several innovative technologies to be presented and illustrated through a variety of examples. The cycle time reductions enabled by this approach promises to result in significant cost and lead-time reductions for large size optics. In addition, corresponding increases in throughput will provide for less capital expenditure per square meter of optic produced. This process, comparative cycles time estimates and preliminary results will be discussed.

Inhibition of DNA replication in Saccharomyces cerevisiae by araCMP.

PubMed

McIntosh, E M; Kunz, B A; Haynes, R H

1986-01-01

Cytosine arabinoside (araC), a potent inhibitor of DNA replication in mammalian cells, was found to be completely ineffective in Saccharomyces cerevisiae. The 5' monophosphate derivative, araCMP, is toxic and effectively inhibits both nuclear and mitochondrial DNA synthesis in this organism. Although wild-type strains can be inhibited by araCMP, dTMP permeable (tup-) strains were found to be much more sensitive to the analogue. In vivo labelling experiments indicate that araC enters yeast cells; however, it is extensively catabolized by deamination and breakage of the glycosidic bond. In addition, the analogue is not efficiently phosphorylated in S. cerevisiae owing to an apparent lack of deoxynucleoside kinase activity. These results provide further evidence that deoxyribonucleotides can be synthesized only through de novo pathways in this organism. Finally, araCMP was found to be recombinagenic in S. cerevisiae which suggests, together with other previous studies, that, in general, inhibition of DNA synthesis in yeast promotes mitotic recombination events.

Bulk growth and surface characterization of epitaxy ready cadmium zinc telluride substrates for use in IR imaging applications

NASA Astrophysics Data System (ADS)

Flint, J. P.; Martinez, B.; Betz, T. E. M.; Mackenzie, J.; Kumar, F. J.; Burgess, L.

2017-02-01

Cadmium Zinc Telluride (Cd1-xZnxTe or CZT) is a compound semiconductor substrate material that has been used for infrared detector (IR) applications for many years. CZT is a perfect substrate for the epitaxial growth of Mercury Cadmium Telluride (Hg1-xCdxTe or MCT) epitaxial layers and remains the material of choice for many high performance IR detectors and focal plane arrays that are used to detect across wide IR spectral bands. Critical to the fabrication of high performance MCT IR detectors is a high quality starting CZT substrate, this being a key determinant of epitaxial layer crystallinity, defectivity and ultimately device electro-optical performance. In this work we report on a new source of substrates suitable for IR detector applications, grown using the Travelling Heater Method (THM). This proven method of crystal growth has been used to manufacture high quality IR specification CZT substrates where industry requirements for IR transmission, dislocations, tellurium precipitates and copper impurity levels have been met. Results will be presented for the chemo-mechanical (CMP) polishing of CZT substrates using production tool sets that are identical to those that are used to produce epitaxy-ready surface finishes on related IR compound semiconductor materials such as GaSb and InSb. We will also discuss the requirements to scale CZT substrate manufacture and how with a new III-V like approach to both CZT crystal growth and substrate polishing, we can move towards a more standardized product and one that can ultimately deliver a standard round CZT substrate, as is the case for competing IR materials such as GaSb, InSb and InP.

The influence of soil organic matter chemistry and site/soil properties in predicting the decomposability of tundra soils

NASA Astrophysics Data System (ADS)

Matamala, R.; Jastrow, J. D.; Fan, Z.; Liang, C.; Calderon, F.; Michaelson, G.; Mishra, U.; Ping, C. L.

2017-12-01

With the increase in high latitude warming, there is a need to better understand the potential vulnerability of soil organic matter (SOM) stored in Arctic regions. In this study, we used mid infrared spectroscopy (MidIR) to determine the influence of soil chemistry and site properties in the short-term mineralization potential of SOM stored in tundra soils. Soils from the active and permafrost layers were collected from four tundra sites on the Coastal Plain, and Arctic Foothills of the North Slope of Alaska and were incubated for 60 days at a range of temperatures. Site and soil properties including acidic versus non-acidic tundra, lowland versus upland areas, total soil organic carbon (TOC) and total nitrogen (TN) concentrations, 60-day carbon mineralization potential (CMP), MidIR spectra and the chemical composition of the SOM stored in these soils were determined. Partial least squares (PLS) models for CMP versus MidIR spectra were produced upon splitting the dataset into site and soil properties categories. We found that SOM composition determined by MidIR spectroscopy was most effective in predicting CMP for tundra soils and it was most relevant for the active-layer mineral and upper permafrost soil horizons and/or soils with C concentrations of 10% or lower. Analysis of the factor loadings and standardized beta coefficients from the CMP PLS models indicated that spectral bands associated with clay contents, phenolic OH, aliphatic, silicates, carboxylic acids, and polysaccharides were influential for lower TOC soils, but these bands were less important for higher TOC soils. High TOC soils were influenced by a combination of other factors. Our results suggest that different factors affect the short-term CMP of SOM in tundra soils depending on the amount of TOC present. We show MidIR as a powerful tool for quickly and reasonably estimating the short-term CMP of tundra soils. Widespread application of MidIR measurements to already collected and archived tundra region soils could provide a quick and reliable assessment of the CMP of these soils, reduce the need for incubation studies, and contribute to upscaling and model benchmarking of SOM mineralization of tundra soils.

Process optimization for ultrasonic vibration assisted polishing of micro-structured surfaces on super hard material

NASA Astrophysics Data System (ADS)

Sun, Zhiyuan; Guo, Bing; Rao, Zhimin; Zhao, Qingliang

2014-08-01

In consideration of the excellent property of SiC, the ground micro-structured surface quality is hard to meet the requirement - consequently the ultrasonic vibration assisted polishing (UVAP) of micro-structures of molds is proposed in this paper. Through the orthogonal experiment, the parameters of UVAP of micro-structures were optimized. The experimental results show that, abrasive polishing process, the effect of the workpiece feed rate on the surface roughness (Ra), groove tip radius (R) and material removal rate (MRR) of micro-structures is significant. While, the UVAP, the most significant effect factor for Ra, R and MRR is the ultrasonic amplitude of the ultrasonic vibration. In addition, within the scope of the polishing process parameters selected by preliminary experiments, ultrasonic amplitude of 2.5μm, polishing force of 0.5N, workpiece feed rate of 5 mm·min-1, polishing wheel rotational speed of 50rpm, polishing time of 35min, abrasive size of 100nm and the polishing liquid concentration of 15% is the best technology of UVAP of micro-structures. Under the optimal parameters, the ground traces on the micro-structured surface were removed efficiently and the integrity of the edges of the micro-structure after grinding was maintained efficiently.

Development of hybrid fluid jet/float polishing process

NASA Astrophysics Data System (ADS)

Beaucamp, Anthony T. H.; Namba, Yoshiharu; Freeman, Richard R.

2013-09-01

On one hand, the "float polishing" process consists of a tin lap having many concentric grooves, cut from a flat by single point diamond turning. This lap is rotated above a hydrostatic bearing spindle of high rigidity, damping and rotational accuracy. The optical surface thus floats above a thin layer of abrasive particles. But whilst surface texture can be smoothed to ~0.1nm rms (as measured by atomic force microscopy), this process can only be used on flat surfaces. On the other hand, the CNC "fluid jet polishing" process consists of pumping a mixture of water and abrasive particles to a converging nozzle, thus generating a polishing spot that can be moved along a tool path with tight track spacing. But whilst tool path feed can be moderated to ultra-precisely correct form error on freeform optical surfaces, surface finish improvement is generally limited to ~1.5nm rms (with fine abrasives). This paper reports on the development of a novel finishing method, that combines the advantages of "fluid jet polishing" (i.e. freeform corrective capability) with "float polishing" (i.e. super-smooth surface finish of 0.1nm rms or less). To come up with this new "hybrid" method, computational fluid dynamic modeling of both processes in COMSOL is being used to characterize abrasion conditions and adapt the process parameters of experimental fluid jet polishing equipment, including: (1) geometrical shape of nozzle, (2) position relative to the surface, (3) control of inlet pressure. This new process is aimed at finishing of next generation X-Ray / Gamma Ray focusing optics.

Delta Doping High Purity CCDs and CMOS for LSST

NASA Technical Reports Server (NTRS)

Blacksberg, Jordana; Nikzad, Shouleh; Hoenk, Michael; Elliott, S. Tom; Bebek, Chris; Holland, Steve; Kolbe, Bill

2006-01-01

A viewgraph presentation describing delta doping high purity CCD's and CMOS for LSST is shown. The topics include: 1) Overview of JPL s versatile back-surface process for CCDs and CMOS; 2) Application to SNAP and ORION missions; 3) Delta doping as a back-surface electrode for fully depleted LBNL CCDs; 4) Delta doping high purity CCDs for SNAP and ORION; 5) JPL CMP thinning process development; and 6) Antireflection coating process development.

Connected Mathematics Project (CMP). What Works Clearinghouse Intervention Report

ERIC Educational Resources Information Center

What Works Clearinghouse, 2010

2010-01-01

The "Connected Mathematics Project" ("CMP") is a mathematics curriculum designed for students in grades 6-8. Each grade level of the curriculum is a full-year program and covers numbers, algebra, geometry/measurement, probability, and statistics. The curriculum uses an investigative approach, and students utilize interactive…

Novel cavitation fluid jet polishing process based on negative pressure effects.

PubMed

Chen, Fengjun; Wang, Hui; Tang, Yu; Yin, Shaohui; Huang, Shuai; Zhang, Guanghua

2018-04-01

Traditional abrasive fluid jet polishing (FJP) is limited by its high-pressure equipment, unstable material removal rate, and applicability to ultra-smooth surfaces because of the evident air turbulence, fluid expansion, and a large polishing spot in high-pressure FJP. This paper presents a novel cavitation fluid jet polishing (CFJP) method and process based on FJP technology. It can implement high-efficiency polishing on small-scale surfaces in a low-pressure environment. CFJP uses the purposely designed polishing equipment with a sealed chamber, which can generate a cavitation effect in negative pressure environment. Moreover, the collapse of cavitation bubbles can spray out a high-energy microjet and shock wave to enhance the material removal. Its feasibility is verified through researching the flow behavior and the cavitation results of the negative pressure cavitation machining of pure water in reversing suction flow. The mechanism is analyzed through a computational fluid dynamics simulation. Thus, its cavitation and surface removal mechanisms in the vertical CFJP and inclined CFJP are studied. A series of polishing experiments on different materials and polishing parameters are conducted to validate its polishing performance compared with FJP. The maximum removal depth increases, and surface roughness gradually decreases with increasing negative outlet pressures. The surface becomes smooth with the increase of polishing time. The experimental results confirm that the CFJP process can realize a high material removal rate and smooth surface with low energy consumption in the low-pressure environment, together with compatible surface roughness to FJP. Copyright © 2017 Elsevier B.V. All rights reserved.

Reduced cost and improved figure of sapphire optical components

NASA Astrophysics Data System (ADS)

Walters, Mark; Bartlett, Kevin; Brophy, Matthew R.; DeGroote Nelson, Jessica; Medicus, Kate

2015-10-01

Sapphire presents many challenges to optical manufacturers due to its high hardness and anisotropic properties. Long lead times and high prices are the typical result of such challenges. The cost of even a simple 'grind and shine' process can be prohibitive. The high precision surfaces required by optical sensor applications further exacerbate the challenge of processing sapphire thereby increasing cost further. Optimax has demonstrated a production process for such windows that delivers over 50% time reduction as compared to traditional manufacturing processes for sapphire, while producing windows with less than 1/5 wave rms figure error. Optimax's sapphire production process achieves significant improvement in cost by implementation of a controlled grinding process to present the best possible surface to the polishing equipment. Following the grinding process is a polishing process taking advantage of chemical interactions between slurry and substrate to deliver excellent removal rates and surface finish. Through experiments, the mechanics of the polishing process were also optimized to produce excellent optical figure. In addition to reducing the cost of producing large sapphire sensor windows, the grinding and polishing technology Optimax has developed aids in producing spherical sapphire components to better figure quality. In addition to reducing the cost of producing large sapphire sensor windows, the grinding and polishing technology Optimax has developed aids in producing spherical sapphire components to better figure quality. Through specially developed polishing slurries, the peak-to-valley figure error of spherical sapphire parts is reduced by over 80%.

Deoxycytidine and Deoxythymidine Treatment for Thymidine Kinase 2 Deficiency.

PubMed

Lopez-Gomez, Carlos; Levy, Rebecca J; Sanchez-Quintero, Maria J; Juanola-Falgarona, Martí; Barca, Emanuele; Garcia-Diaz, Beatriz; Tadesse, Saba; Garone, Caterina; Hirano, Michio

2017-05-01

Thymidine kinase 2 (TK2), a critical enzyme in the mitochondrial pyrimidine salvage pathway, is essential for mitochondrial DNA (mtDNA) maintenance. Mutations in the nuclear gene, TK2, cause TK2 deficiency, which manifests predominantly in children as myopathy with mtDNA depletion. Molecular bypass therapy with the TK2 products, deoxycytidine monophosphate (dCMP) and deoxythymidine monophosphate (dTMP), prolongs the life span of Tk2-deficient (Tk2 -/- ) mice by 2- to 3-fold. Because we observed rapid catabolism of the deoxynucleoside monophosphates to deoxythymidine (dT) and deoxycytidine (dC), we hypothesized that: (1) deoxynucleosides might be the major active agents and (2) inhibition of deoxycytidine deamination might enhance dTMP+dCMP therapy. To test these hypotheses, we assessed two therapies in Tk2 -/- mice: (1) dT+dC and (2) coadministration of the deaminase inhibitor, tetrahydrouridine (THU), with dTMP+dCMP. We observed that dC+dT delayed disease onset, prolonged life span of Tk2-deficient mice and restored mtDNA copy number as well as respiratory chain enzyme activities and levels. In contrast, dCMP+dTMP+THU therapy decreased life span of Tk2 -/- animals compared to dCMP+dTMP. Our studies demonstrate that deoxynucleoside substrate enhancement is a novel therapy, which may ameliorate TK2 deficiency in patients. Ann Neurol 2017;81:641-652. © 2017 American Neurological Association.

Increased circulating cell-derived microparticle count is associated with recurrent implantation failure after IVF and embryo transfer.

PubMed

Martínez-Zamora, M Angeles; Tàssies, Dolors; Reverter, Juan Carlos; Creus, Montserrat; Casals, Gemma; Cívico, Salvadora; Carmona, Francisco; Balasch, Juan

2016-08-01

Cell-derived microparticles (cMPs) are small membrane vesicles that are released from many different cell types in response to cellular activation or apoptosis. Elevated cMP counts have been found in almost all thrombotic diseases and pregnancy wastage, such as recurrent spontaneous abortion and in a number of conditions associated with inflammation, cellular activation and angiogenesis. cMP count was investigated in patients experiencing unexplained recurrent implantation failure (RIF). The study group was composed of 30 women diagnosed with RIF (RIF group). The first control group (IVF group) (n = 30) comprised patients undergoing a first successful IVF cycle. The second control group (FER group) included 30 healthy women who had at least one child born at term and no history of infertility or obstetric complications. cMP count was significantly higher in the RIF group compared with the IVF and FER groups (P < 0.05 and P < 0.01, respectively) (RIF group: 15.8 ± 6.2 nM phosphatidylserine equivalent [PS eq]; IVF group: 10.9 ± 5.3 nM PS eq; FER group: 9.6 ± 4.0 nM PS eq). No statistical difference was found in cMP count between the IVF and FER groups. Increased cMP count is, therefore, associated with RIF after IVF and embryo transfer. Copyright © 2016. Published by Elsevier Ltd.

MRF with adjustable pH

NASA Astrophysics Data System (ADS)

Jacobs, Stephen D.

2011-10-01

Deterministic final polishing of high precision optics using sub-aperture processing with magnetorheological finishing (MRF) is an accepted practice throughout the world. A wide variety of materials can be successfully worked with aqueous (pH 10), magnetorheological (MR) fluids, using magnetic carbonyl iron (CI) and either ceria or nanodiamond nonmagnetic abrasives. Polycrystalline materials like zinc sulfide (ZnS) and zinc selenide (ZnSe) are difficult to polish at pH 10 with MRF, due to their grain size and the relatively low stiffness of the MR fluid lap. If microns of material are removed, the grain structure of the material begins to appear. In 2005, Kozhinova et al. (Appl. Opt. 44 4671-4677) demonstrated that lowering pH could improve MRF of ZnS. However, magnetic CI particle corrosion rendered their low pH approach unstable and unsuitable for commercial implementation. In 2009, Shafrir et al. described a sol-gel coating process for manufacturing a zirconia-coated CI particle that protects the magnetic core from aqueous corrosion (Appl. Opt .48 6797-6810). The coating process produces free nanozirconia polishing abrasives during the coating procedure, thereby creating an MR polishing powder that is "self-charged" with the polishing abrasive. By simply adding water, it was possible to polish optical glasses and ceramics with good stability at pH 8 for three weeks. The development of a corrosion resistant, MR polishing powder, opens up the possibility for polishing additional materials, wherein the pH may be adjusted to optimize effectiveness. In this paper we describe the CI coating process, the characterization of the coated powder, and procedures for making stable MR fluids with adjustable pH, giving polishing results for a variety of optical glasses and crystalline ceramics.

Validity of Self-Reported Concentration and Memory Problems: Relationship with Neuropsychological Assessment and Depression

EPA Science Inventory

Background: This study investigated the validity of self-reported concentration and memory problems (CMP) in residents environmentally exposed to manganese (Mn). Method: Self-report of CMP from a health questionnaire (HQ) and the Symptoms Checklist-90-Revised (SCL-90-R) was com...

Incorporating Nondrug Social & Recreational Activities in Outpatient Chemical Dependency Treatment

ERIC Educational Resources Information Center

Siporin, Sheldon; Baron, Lisa

2012-01-01

"Contingency Management programs (CMP) and non-drug social and recreational activities (NDSRA) are interventions premised on behavior theory that rely on external sources of reinforcement alternative to drug-based forms to decrease drug use. CMP usually employs vouchers as reinforcement for negative toxicologies. Despite research support, CMP…

42 CFR 417.594 - Computation of adjusted community rate (ACR).

Code of Federal Regulations, 2012 CFR

2012-10-01

... HUMAN SERVICES (CONTINUED) MEDICARE PROGRAM (CONTINUED) HEALTH MAINTENANCE ORGANIZATIONS, COMPETITIVE... or CMP develops an aggregate premium for all its enrollees and weights the aggregate by the size of... groups are defined as employee groups or other bodies of subscribers that enroll in the HMO or CMP...

42 CFR 417.594 - Computation of adjusted community rate (ACR).

Code of Federal Regulations, 2014 CFR

2014-10-01

... HUMAN SERVICES (CONTINUED) MEDICARE PROGRAM (CONTINUED) HEALTH MAINTENANCE ORGANIZATIONS, COMPETITIVE... or CMP develops an aggregate premium for all its enrollees and weights the aggregate by the size of... groups are defined as employee groups or other bodies of subscribers that enroll in the HMO or CMP...

42 CFR 417.594 - Computation of adjusted community rate (ACR).

Code of Federal Regulations, 2013 CFR

2013-10-01

... HUMAN SERVICES (CONTINUED) MEDICARE PROGRAM (CONTINUED) HEALTH MAINTENANCE ORGANIZATIONS, COMPETITIVE... or CMP develops an aggregate premium for all its enrollees and weights the aggregate by the size of... groups are defined as employee groups or other bodies of subscribers that enroll in the HMO or CMP...

42 CFR 417.424 - Denial of enrollment.

Code of Federal Regulations, 2012 CFR

2012-10-01

... the criteria of § 417.422 if acceptance would— (1) Cause the number of enrollees who are Medicare or... become substantially nonrepresentative of the general population in the HMO's or CMP's geographic area... the enrollment of the HMO or CMP substantially nonrepresentative of the general population in the HMO...

42 CFR 417.424 - Denial of enrollment.

Code of Federal Regulations, 2014 CFR

2014-10-01

... the criteria of § 417.422 if acceptance would— (1) Cause the number of enrollees who are Medicare or... become substantially nonrepresentative of the general population in the HMO's or CMP's geographic area... the enrollment of the HMO or CMP substantially nonrepresentative of the general population in the HMO...

42 CFR 417.424 - Denial of enrollment.

Code of Federal Regulations, 2013 CFR

2013-10-01

... the criteria of § 417.422 if acceptance would— (1) Cause the number of enrollees who are Medicare or... become substantially nonrepresentative of the general population in the HMO's or CMP's geographic area... the enrollment of the HMO or CMP substantially nonrepresentative of the general population in the HMO...

42 CFR 417.458 - Recoupment of uncollected deductible and coinsurance amounts.

Code of Federal Regulations, 2010 CFR

2010-10-01

..., DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICARE PROGRAM HEALTH MAINTENANCE ORGANIZATIONS... Medicare Contract § 417.458 Recoupment of uncollected deductible and coinsurance amounts. An HMO or CMP... previous contract period except in the following circumstances: (a) The HMO or CMP failed to collect the...

42 CFR 417.422 - Eligibility to enroll in an HMO or CMP.

Code of Federal Regulations, 2010 CFR

2010-10-01

... SERVICES (CONTINUED) MEDICARE PROGRAM HEALTH MAINTENANCE ORGANIZATIONS, COMPETITIVE MEDICAL PLANS, AND HEALTH CARE PREPAYMENT PLANS Enrollment, Entitlement, and Disenrollment under Medicare Contract § 417.422... entered into a contract under subpart L of this part; (d) During an enrollment period of the HMO or CMP...

Connected Mathematics Project (CMP). What Works Clearinghouse Intervention Report. Updated

ERIC Educational Resources Information Center

What Works Clearinghouse, 2017

2017-01-01

"Connected Mathematics Project" (CMP) is a math curriculum for students in grades 6-8. It uses interactive problems and everyday situations to explore mathematical ideas, with a goal of fostering a problem-centered, inquiry-based learning environment. At each grade level, the curriculum covers numbers, algebra, geometry/measurement,…

48 CFR 732.406-74 - Revocation of the LOC.

Code of Federal Regulations, 2011 CFR

2011-10-01

....406-74 Section 732.406-74 Federal Acquisition Regulations System AGENCY FOR INTERNATIONAL DEVELOPMENT GENERAL CONTRACTING REQUIREMENTS CONTRACT FINANCING Advance Payments 732.406-74 Revocation of the LOC. If during the term of the contract FM/CMP believes that the LOC should be revoked, FM/CMP may, after...

48 CFR 732.406-74 - Revocation of the LOC.

Code of Federal Regulations, 2010 CFR

2010-10-01

....406-74 Section 732.406-74 Federal Acquisition Regulations System AGENCY FOR INTERNATIONAL DEVELOPMENT GENERAL CONTRACTING REQUIREMENTS CONTRACT FINANCING Advance Payments 732.406-74 Revocation of the LOC. If during the term of the contract FM/CMP believes that the LOC should be revoked, FM/CMP may, after...

42 CFR 417.576 - Final settlement.

Code of Federal Regulations, 2013 CFR

2013-10-01

... the HMO's or CMP's submission and CMS's review of an independently certified cost report and... that begin on or after January 1, 1996, the costs of hospital and SNF services paid by Medicare's intermediaries under the option provided by § 417.532(d). (ii) The HMO's or CMP's methods of apportioning cost...

42 CFR 417.576 - Final settlement.

Code of Federal Regulations, 2012 CFR

2012-10-01

... the HMO's or CMP's submission and CMS's review of an independently certified cost report and... that begin on or after January 1, 1996, the costs of hospital and SNF services paid by Medicare's intermediaries under the option provided by § 417.532(d). (ii) The HMO's or CMP's methods of apportioning cost...

Ion-Deposited Polished Coatings

NASA Technical Reports Server (NTRS)

Banks, B. A.

1986-01-01

Polished, dense, adherent coatings relatively free of imperfections. New process consists of using broad-beam ion source in evacuated chamber to ion-clean rotating surface that allows grazing incidence of ion beam. This sputter cleans off absorbed gases, organic contaminants, and oxides of mirror surface. In addition to cleaning, surface protrusions sputter-etched away. Process particularly adaptable to polishing of various substrates for optical or esthetic purposes.

Weighted stacking of seismic AVO data using hybrid AB semblance and local similarity

NASA Astrophysics Data System (ADS)

Deng, Pan; Chen, Yangkang; Zhang, Yu; Zhou, Hua-Wei

2016-04-01

The common-midpoint (CMP) stacking technique plays an important role in enhancing the signal-to-noise ratio (SNR) in seismic data processing and imaging. Weighted stacking is often used to improve the performance of conventional equal-weight stacking in further attenuating random noise and handling the amplitude variations in real seismic data. In this study, we propose to use a hybrid framework of combining AB semblance and a local-similarity-weighted stacking scheme. The objective is to achieve an optimal stacking of the CMP gathers with class II amplitude-variation-with-offset (AVO) polarity-reversal anomaly. The selection of high-quality near-offset reference trace is another innovation of this work because of its better preservation of useful energy. Applications to synthetic and field seismic data demonstrate a great improvement using our method to capture the true locations of weak reflections, distinguish thin-bed tuning artifacts, and effectively attenuate random noise.

Facilitating Scholarly Writing in Academic Medicine

PubMed Central

Pololi, Linda; Knight, Sharon; Dunn, Kathleen

2004-01-01

Scholarly writing is a critical skill for faculty in academic medicine; however, few faculty receive instruction in the process. We describe the experience of 18 assistant professors who participated in a writing and faculty development program which consisted of 7 monthly 75-minute sessions embedded in a Collaborative Mentoring Program (CMP). Participants identified barriers to writing, developed personal writing strategies, had time to write, and completed monthly writing contracts. Participants provided written responses to open-ended questions about the learning experience, and at the end of the program, participants identified manuscripts submitted for publication, and completed an audiotaped interview. Analysis of qualitative data using data reduction, data display, and conclusion drawing/verification showed that this writing program facilitated the knowledge, skills, and support needed to foster writing productivity. All participants completed at least 1 scholarly manuscript by the end of the CMP. The impact on participants’ future academic productivity requires long-term follow-up. PMID:14748862

Increased Use of Care Management Processes and Expanded Health Information Technology Functions by Practice Ownership and Medicaid Revenue.

PubMed

Rodriguez, Hector P; McClellan, Sean R; Bibi, Salma; Casalino, Lawrence P; Ramsay, Patricia P; Shortell, Stephen M

2016-06-01

Practice ownership and Medicaid revenue may affect the use of care management processes (CMPs) for chronic conditions and expansion of health information technology (HIT). Using a national cohort of medical practices, we compared the use of CMPs and HIT from 2006/2008 to 2013 by practice ownership and level of Medicaid revenue. Poisson regression models estimated changes in CMP use, and linear regression estimated changes in HIT, by practice ownership and Medicaid patient revenue, controlling for other practice characteristics. Compared with physician-owned practices, system-owned practices adopted a greater number of CMPs and HIT functions over time (p < .001). High Medicaid revenue (≥30.0%) was associated with less adoption of CMPs (p < .001) and HIT (p < .01). System-owned practices (p < .001) and community health centers (p < .001) with high Medicaid revenue were more likely than physician-owned practices with high Medicaid revenue to adopt CMPs over time. System and community health center ownership appear to help high Medicaid practices overcome CMP adoption constraints. © The Author(s) 2015.

Silicon direct bonding approach to high voltage power device (insulated gate bipolar transistors)

NASA Astrophysics Data System (ADS)

Cha, Giho; Kim, Youngchul; Jang, Hyungwoo; Kang, Hyunsoon; Song, Changsub

2001-10-01

Silicon direct bonding technique was successfully applied for the fabrication of high voltage IGBT (Insulated Gate Bipolar Transistor). In this work, 5 inch, p-type CZ wafer for handle wafer and n-type FZ wafer for device wafer were used and bonding the two wafers was performed at reduced pressure (1mmTorr) using a modified vacuum bonding machine. Since the breakdown voltage in high voltage device has been determined by the remained thickness of device layer, grinding and CMP steps should be carefully designed in order to acquire better uniformity of device layer. In order to obtain the higher removal rate and the final better uniformity of device layer, the harmony of the two processes must be considered. We found that the concave type of grinding profile and the optimal thickness of ground wafer was able to reduce the process time of CMP step and also to enhance the final thickness uniformity of device layer up to +/- 1%. Finally, when compared epitaxy layer with SDB wafer, the SDB wafer was found to be more favorable in terms of cost and electrical characteristics.

Identification of cytidine 2',3'-cyclic monophosphate and uridine 2',3'-cyclic monophosphate in Pseudomonas fluorescens pfo-1 culture.

PubMed

Bordeleau, Emily; Oberc, Christopher; Ameen, Eve; da Silva, Amanda Mendes; Yan, Hongbin

2014-09-15

Cytidine 2',3'-cyclic monophosphate (2',3'-cCMP) and uridine 2',3'-cyclic monophosphate (2',3'-cUMP) were isolated from Pseudomonas fluorescens pfo-1 cell extracts by semi-preparative reverse phase HPLC. The structures of the two compounds were confirmed by NMR and mass spectroscopy against commercially available authentic samples. Concentrations of both intracellular and extracellular 2',3'-cCMP and 2',3'-cUMP were determined. Addition of 2',3'-cCMP and 2',3'-cUMP to P. fluorescens pfo-1 culture did not significantly affect the level of biofilm formation in static liquid cultures. Copyright © 2014 Elsevier Ltd. All rights reserved.

Numerical Simulation Analysis of High-precision Dispensing Needles for Solid-liquid Two-phase Grinding

NASA Astrophysics Data System (ADS)

Li, Junye; Hu, Jinglei; Wang, Binyu; Sheng, Liang; Zhang, Xinming

2018-03-01

In order to investigate the effect of abrasive flow polishing surface variable diameter pipe parts, with high precision dispensing needles as the research object, the numerical simulation of the process of polishing high precision dispensing needle was carried out. Analysis of different volume fraction conditions, the distribution of the dynamic pressure and the turbulence viscosity of the abrasive flow field in the high precision dispensing needle, through comparative analysis, the effectiveness of the abrasive grain polishing high precision dispensing needle was studied, controlling the volume fraction of silicon carbide can change the viscosity characteristics of the abrasive flow during the polishing process, so that the polishing quality of the abrasive grains can be controlled.

Ultra-low roughness magneto-rheological finishing for EUV mask substrates

NASA Astrophysics Data System (ADS)

Dumas, Paul; Jenkins, Richard; McFee, Chuck; Kadaksham, Arun J.; Balachandran, Dave K.; Teki, Ranganath

2013-09-01

EUV mask substrates, made of titania-doped fused silica, ideally require sub-Angstrom surface roughness, sub-30 nm flatness, and no bumps/pits larger than 1 nm in height/depth. To achieve the above specifications, substrates must undergo iterative global and local polishing processes. Magnetorheological finishing (MRF) is a local polishing technique which can accurately and deterministically correct substrate figure, but typically results in a higher surface roughness than the current requirements for EUV substrates. We describe a new super-fine MRF® polishing fluid whichis able to meet both flatness and roughness specifications for EUV mask blanks. This eases the burden on the subsequent global polishing process by decreasing the polishing time, and hence the defectivity and extent of figure distortion.

Composite adaptive control of belt polishing force for aero-engine blade

NASA Astrophysics Data System (ADS)

Zhsao, Pengbing; Shi, Yaoyao

2013-09-01

The existing methods for blade polishing mainly focus on robot polishing and manual grinding. Due to the difficulty in high-precision control of the polishing force, the blade surface precision is very low in robot polishing, in particular, quality of the inlet and exhaust edges can not satisfy the processing requirements. Manual grinding has low efficiency, high labor intensity and unstable processing quality, moreover, the polished surface is vulnerable to burn, and the surface precision and integrity are difficult to ensure. In order to further improve the profile accuracy and surface quality, a pneumatic flexible polishing force-exerting mechanism is designed and a dual-mode switching composite adaptive control(DSCAC) strategy is proposed, which combines Bang-Bang control and model reference adaptive control based on fuzzy neural network(MRACFNN) together. By the mode decision-making mechanism, Bang-Bang control is used to track the control command signal quickly when the actual polishing force is far away from the target value, and MRACFNN is utilized in smaller error ranges to improve the system robustness and control precision. Based on the mathematical model of the force-exerting mechanism, simulation analysis is implemented on DSCAC. Simulation results show that the output polishing force can better track the given signal. Finally, the blade polishing experiments are carried out on the designed polishing equipment. Experimental results show that DSCAC can effectively mitigate the influence of gas compressibility, valve dead-time effect, valve nonlinear flow, cylinder friction, measurement noise and other interference on the control precision of polishing force, which has high control precision, strong robustness, strong anti-interference ability and other advantages compared with MRACFNN. The proposed research achieves high-precision control of the polishing force, effectively improves the blade machining precision and surface consistency, and significantly reduces the surface roughness.

42 CFR 417.544 - Physicians' services furnished directly by the HMO or CMP.

Code of Federal Regulations, 2010 CFR

2010-10-01

... attributable to salaries, wages, incentive payments, fringe benefits) must be distinguished from the cost of... 42 Public Health 3 2010-10-01 2010-10-01 false Physicians' services furnished directly by the HMO or CMP. 417.544 Section 417.544 Public Health CENTERS FOR MEDICARE & MEDICAID SERVICES, DEPARTMENT OF...

75 FR 9864 - Fisheries of the Caribbean, Gulf of Mexico and South Atlantic; Comprehensive Ecosystem-Based...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-03-04

... Coastal Migratory Pelagic (CMP) Resources (CMP FMP); and the FMP for the Spiny Lobster Fishery of the Gulf... golden crab and deepwater shrimp fisheries while extending protection for deepwater coral ecosystems. CE-BA 1 would also amend the Coral, Shrimp, Coastal Migratory Pelagics, Golden Crab, Spiny Lobster...

Clinicians' and Patients' Assessment of Activity Overuse and Underuse and Its Relation to Physical Capacity

ERIC Educational Resources Information Center

de Jong, Annemieke Bonny; Preuper, Henrica R. Schiphorst; Reneman, Michiel F.

2012-01-01

To explore clinicians' and patients' (self)-assessment of activity overuse and underuse, and its relationship with physical capacity in patients with chronic musculoskeletal pain (CMP). Study design was cross-sectional. Participants included patients with CMP, admitted to a multidisciplinary outpatient pain rehabilitation program. The main…

42 CFR 417.440 - Entitlement to health care services from an HMO or CMP.

Code of Federal Regulations, 2010 CFR

2010-10-01

... HEALTH AND HUMAN SERVICES (CONTINUED) MEDICARE PROGRAM HEALTH MAINTENANCE ORGANIZATIONS, COMPETITIVE... Contract § 417.440 Entitlement to health care services from an HMO or CMP. (a) Basic rules. (1) Subject to... not converted to the risk portion of the contract, may enroll in a special supplemental plan, if...

Medicare and State Health Care Programs: Fraud and Abuse; Revisions to the Office of Inspector General's Civil Monetary Penalty Rules. Final rule.

PubMed

2016-12-07

This final rule amends the civil monetary penalty (CMP or penalty) rules of the Office of Inspector General to incorporate new CMP authorities, clarify existing authorities, and reorganize regulations on civil money penalties, assessments, and exclusions to improve readability and clarity.

42 CFR 417.558 - Emergency, urgently needed, and out-of-area services for which the HMO or CMP accepts...

Code of Federal Regulations, 2010 CFR

2010-10-01

... services for which the HMO or CMP accepts responsibility. 417.558 Section 417.558 Public Health CENTERS FOR MEDICARE & MEDICAID SERVICES, DEPARTMENT OF HEALTH AND HUMAN SERVICES (CONTINUED) MEDICARE PROGRAM HEALTH MAINTENANCE ORGANIZATIONS, COMPETITIVE MEDICAL PLANS, AND HEALTH CARE PREPAYMENT PLANS Medicare Payment: Cost...

Chitin nanofibrils for rapid and efficient removal of metal ions from water system.

PubMed

Liu, Dagang; Zhu, Yi; Li, Zehui; Tian, Donglin; Chen, Lei; Chen, Peng

2013-10-15

Joint mechanical defibrillation was successfully used to downsize chitin micro-particles (CMP) into nanofibrils without changing its chemical or crystalline structure. The fine chitin nanofibrils (CNF) bearing width of about 50 nm and length of more than 1 μm were then developed as heavy metal ion sorbents. The uptake performance of CNF dependent on pH, ionic concentration, time, and temperature was investigated. Results show that fixation amount of Cd(II), Ni(II), Cu(II), Zn(II), Pb(II), Cr(III) on CNF was up to 2.94, 2.30, 2.22, 2.06, 1.46, and 0.31 mmol/g, respectively, much higher than CMP due to high specific surface area and widely distributed pores of CNF. Adsorption kinetics of CMP and CNF followed pseudo-second-order model and Freundlich isotherm although CNF exhibited higher rate constant and sorption capacity than that of CMP. The defibrillated CNF is renewable, feasible, easily recyclable, and is thought as good candidate for heavy metal ion treatment due to their low sorption energy, rapid and efficient uptake capacity. Copyright © 2013 Elsevier Ltd. All rights reserved.

Ribonucleotide incorporation by human DNA polymerase η impacts translesion synthesis and RNase H2 activity

PubMed Central

Mentegari, Elisa; Crespan, Emmanuele; Bavagnoli, Laura; Kissova, Miroslava; Bertoletti, Federica; Sabbioneda, Simone; Imhof, Ralph; Sturla, Shana J.; Nilforoushan, Arman; Hübscher, Ulrich; van Loon, Barbara

2017-01-01

Abstract Ribonucleotides (rNs) incorporated in the genome by DNA polymerases (Pols) are removed by RNase H2. Cytidine and guanosine preferentially accumulate over the other rNs. Here we show that human Pol η can incorporate cytidine monophosphate (rCMP) opposite guanine, 8-oxo-7,8-dihydroguanine, 8-methyl-2΄-deoxyguanosine and a cisplatin intrastrand guanine crosslink (cis-PtGG), while it cannot bypass a 3-methylcytidine or an abasic site with rNs as substrates. Pol η is also capable of synthesizing polyribonucleotide chains, and its activity is enhanced by its auxiliary factor DNA Pol δ interacting protein 2 (PolDIP2). Human RNase H2 removes cytidine and guanosine less efficiently than the other rNs and incorporation of rCMP opposite DNA lesions further reduces the efficiency of RNase H2. Experiments with XP-V cell extracts indicate Pol η as the major basis of rCMP incorporation opposite cis-PtGG. These results suggest that translesion synthesis by Pol η can contribute to the accumulation of rCMP in the genome, particularly opposite modified guanines. PMID:27994034

Chemistry and Formation of the Beilby Layer During Polishing of Fused Silica Glass

DOE PAGES

Suratwala, Tayyab; Steele, William; Wong, Lana; ...

2015-05-19

The chemical characteristics and the proposed formation mechanisms of the modified surface layer (called the Beilby layer) on polished fused silica glasses are described. Fused silica glass samples were polished using different slurries, polyurethane pads, and at different rotation rates. The concentration profiles of several key contaminants, such as Ce, K, and H, were measured in the near surface layer of the polished samples using Secondary Ion Mass Spectroscopy (SIMS). The penetration of K, originating from KOH used for pH control during polishing, decreased with increase in polishing material removal rate. In contrast, penetration of the Ce and H increasedmore » with increase in polishing removal rate. In addition, Ce penetration was largely independent of the other polishing parameters (e.g., particle size distribution and the properties of the polishing pad). The resulting K concentration depth profiles are described using a two-step diffusion process: (1) steady-state moving boundary diffusion (due to material removal during polishing) followed by (2) simple diffusion during ambient postpolishing storage. Using known alkali metal diffusion coefficients in fused silica glass, this diffusion model predicts concentration profiles that are consistent with the measured data at various polishing material removal rates. On the other hand, the observed Ce profiles are inconsistent with diffusion based transport. Rather we propose that Ce penetration is governed by the ratio of Ce–O–Si and Si–O–Si hydrolysis rates; where this ratio increases with interface temperature (which increases with polishing material removal rate) resulting in greater Ce penetration into the Beilby layer. Calculated Ce surface concentrations using this mechanism are in good agreement to the observed change in measured Ce surface concentrations with polishing material removal rate. In conclusion, these new insights into the chemistry of the Beilby layer, combined together with details of the single particle removal function during polishing, are used to develop a more detailed and quantitative picture of the polishing process and the formation of the Beilby layer.« less

Antibody-independent identification of bovine milk-derived peptides in breast-milk.

PubMed

Picariello, Gianluca; Addeo, Francesco; Ferranti, Pasquale; Nocerino, Rita; Paparo, Lorella; Passariello, Annalisa; Dallas, David C; Robinson, Randall C; Barile, Daniela; Canani, Roberto Berni

2016-08-10

Exclusively breast-fed infants can exhibit clear signs of IgE or non IgE-mediated cow's milk allergy. However, the definite characterization of dietary cow's milk proteins (CMP) that survive the maternal digestive tract to be absorbed into the bloodstream and secreted into breast milk remains missing. Herein, we aimed at assessing possible CMP-derived peptides in breast milk. Using high performance liquid chromatography (HPLC)-high resolution mass spectrometry (MS), we compared the peptide fraction of breast milk from 12 donors, among which 6 drank a cup of milk daily and 6 were on a strict dairy-free diet. We identified two bovine β-lactoglobulin (β-Lg, 2 out 6 samples) and one αs1-casein (1 out 6 samples) fragments in breast milk from mothers receiving a cup of bovine milk daily. These CMP-derived fragments, namely β-Lg (f42-54), (f42-57) and αs1-casein (f180-197), were absent in milk from mothers on dairy-free diet. In contrast, neither intact nor hydrolyzed β-Lg was detected by western blot and competitive ELISA in any breast milk sample. Eight additional bovine milk-derived peptides identified by software-assisted MS were most likely false positive. The results of this study demonstrate that CMP-derived peptides rather than intact CMP may sensitize or elicit allergic responses in the neonate through mother's milk. Immunologically active peptides from the maternal diet could be involved in priming the newborn's immune system, driving a tolerogenic response.

Case mix, outcome and length of stay for admissions to adult, general critical care units in England, Wales and Northern Ireland: the Intensive Care National Audit & Research Centre Case Mix Programme Database

PubMed Central

2005-01-01

Introduction The present paper describes the methods of data collection and validation employed in the Intensive Care National Audit & Research Centre Case Mix Programme (CMP), a national comparative audit of outcome for adult, critical care admissions. The paper also describes the case mix, outcome and activity of the admissions in the Case Mix Programme Database (CMPD). Methods The CMP collects data on consecutive admissions to adult, general critical care units in England, Wales and Northern Ireland. Explicit steps are taken to ensure the accuracy of the data, including use of a dataset specification, of initial and refresher training courses, and of local and central validation of submitted data for incomplete, illogical and inconsistent values. Criteria for evaluating clinical databases developed by the Directory of Clinical Databases were applied to the CMPD. The case mix, outcome and activity for all admissions were briefly summarised. Results The mean quality level achieved by the CMPD for the 10 Directory of Clinical Databases criteria was 3.4 (on a scale of 1 = worst to 4 = best). The CMPD contained validated data on 129,647 admissions to 128 units. The median age was 63 years, and 59% were male. The mean Acute Physiology and Chronic Health Evaluation II score was 16.5. Mortality was 20.3% in the CMP unit and was 30.8% at ultimate discharge from hospital. Nonsurvivors stayed longer in intensive care than did survivors (median 2.0 days versus 1.7 days in the CMP unit) but had a shorter total hospital length of stay (9 days versus 16 days). Results for the CMPD were comparable with results from other published reports of UK critical care admissions. Conclusions The CMP uses rigorous methods to ensure data are complete, valid and reliable. The CMP scores well against published criteria for high-quality clinical databases.

Case mix, outcome and length of stay for admissions to adult, general critical care units in England, Wales and Northern Ireland: the Intensive Care National Audit & Research Centre Case Mix Programme Database

PubMed Central

Harrison, David A; Brady, Anthony R; Rowan, Kathy

2004-01-01

Introduction The present paper describes the methods of data collection and validation employed in the Intensive Care National Audit & Research Centre Case Mix Programme (CMP), a national comparative audit of outcome for adult, critical care admissions. The paper also describes the case mix, outcome and activity of the admissions in the Case Mix Programme Database (CMPD). Methods The CMP collects data on consecutive admissions to adult, general critical care units in England, Wales and Northern Ireland. Explicit steps are taken to ensure the accuracy of the data, including use of a dataset specification, of initial and refresher training courses, and of local and central validation of submitted data for incomplete, illogical and inconsistent values. Criteria for evaluating clinical databases developed by the Directory of Clinical Databases were applied to the CMPD. The case mix, outcome and activity for all admissions were briefly summarised. Results The mean quality level achieved by the CMPD for the 10 Directory of Clinical Databases criteria was 3.4 (on a scale of 1 = worst to 4 = best). The CMPD contained validated data on 129,647 admissions to 128 units. The median age was 63 years, and 59% were male. The mean Acute Physiology and Chronic Health Evaluation II score was 16.5. Mortality was 20.3% in the CMP unit and was 30.8% at ultimate discharge from hospital. Nonsurvivors stayed longer in intensive care than did survivors (median 2.0 days versus 1.7 days in the CMP unit) but had a shorter total hospital length of stay (9 days versus 16 days). Results for the CMPD were comparable with results from other published reports of UK critical care admissions. Conclusions The CMP uses rigorous methods to ensure data are complete, valid and reliable. The CMP scores well against published criteria for high-quality clinical databases. PMID:15025784

Immunochemical characterization of Glycine max L. Merr. var Raiden, as a possible hypoallergenic substitute for cow's milk-allergic patients.

PubMed

Curciarello, R; Lareu, J F; Fossati, C A; Docena, G H; Petruccelli, S

2008-09-01

Cows' milk allergy (CMA) is the most common cause of food allergy in infancy. The only proven treatment is the complete elimination of cows' milk proteins (CMPs) from the diet by means of hypoallergenic formulas. Soybean-based formulae are widely used although intolerance to soy has been reported to occur in 15-40% of infants with CMA. The aim of this work was to analyse the in vitro reactivity of the soybean cultivar Raiden, which naturally lacks glycinin A(4)A(5)B(3), to evaluate whether this genotype could be a safe CMP substitute for CMA patients. The reactivity of conventional soybean (CS) and Raiden soybean (RS) genotypes and also recombinant glycinin A(4)A(5)B(3) and alphabeta-conglycinin with casein-specific monoclonal antibodies and CMP-specific polyclonal serum was evaluated by immunoblotting and ELISA. A sequential competitive ELISA with the polyclonal antiserum and different soluble inhibitors was performed. In addition, an indirect ELISA with sera of atopic children with CMA was carried out to analyse the IgE-binding capacity of the different soybean components. We have shown that CS contains four components that cross-react with CMP, while RS has only one. The remaining cross-reactive component in RS was identified as alpha-subunit beta-conglycinin. By means of inhibitory ELISA, we demonstrated that CS, RS and the alpha-subunit beta-conglycinin extracts inhibited the binding of CMP-specific antibodies to the CMP-coated solid phase. Finally, we showed that CS, RS and the recombinant proteins were recognized by human CMP-specific IgE antibodies. This work shows that although Raiden has fewer cross-reactive components than conventional soybean, it still has a residual cross-reactive component: the alpha-subunit beta-conglycinin. This reactivity might make this genotype unsuitable to treat CMA and also explains adverse reactions to soybean in CMA infants.

Zerodur polishing process for high surface quality and high efficiency

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tesar, A.; Fuchs, B.

1992-08-01

Zerodur is a glass-ceramic composite importance in applications where temperature instabilities influence optical and mechanical performance, such as in earthbound and spaceborne telescope mirror substrates. Polished Zerodur surfaces of high quality have been required for laser gyro mirrors. Polished surface quality of substrates affects performance of high reflection coatings. Thus, the interest in improving Zerodur polished surface quality has become more general. Beyond eliminating subsurface damage, high quality surfaces are produced by reducing the amount of hydrated material redeposited on the surface during polishing. With the proper control of polishing parameters, such surfaces exhibit roughnesses of

Study on optical polishing experiment of zerodur mirror

NASA Astrophysics Data System (ADS)

Wang, Huijun; Li, Hang; Wang, Peng; Guo, Wen; Wang, Yonggang; Du, Yan; Dong, Huiwen

2014-08-01

A zerodur mirror whose aperture is 900mm is chosen to be the primary mirror of an optical system. The mirror is polished by rapid polishing and precision polishing methods relatively. The final surface figures of the mirror are as follows: the peak-to-valley value (P-V value) is 0.204λ (λ=632.8nm), and the root-mean-square value (RMS value) is 0.016λ, which meet the requirement of the optical system. The results show that the polishing process is feasible.

77 FR 68748 - Intent To Prepare a Draft Environmental Impact Statement and Feasibility Report for the Cano...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-11-16

... recreation and tourism, with minimal temporary negative impact on the ecosystem and the adjacent communities... public spaces for recreation and interaction between the communities, visitors and the CMP identified as... impoverished communities in San Juan, the CMP connects the San Juan Bay with the San Jose and Los Corozos...

75 FR 14548 - Fisheries of the Caribbean, Gulf of Mexico, and South Atlantic; Comprehensive Ecosystem-Based...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-03-26

... the FMP for Coastal Migratory Pelagic (CMP) Resources (CMP FMP); and the FMP for the Spiny Lobster Fishery of the Gulf of Mexico and South Atlantic (Spiny Lobster FMP), as prepared and submitted by the... bottom habitats; dolphin and wahoo; golden crab; shrimp; spiny lobster; and snapper-grouper off the...

75 FR 35330 - Fisheries of the Caribbean, Gulf of Mexico, and South Atlantic; Comprehensive Ecosystem-Based...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-06-22

... Migratory Pelagic (CMP) Resources (CMP FMP); and the FMP for the Spiny Lobster Fishery of the Gulf of Mexico and South Atlantic (Spiny Lobster FMP), as prepared and submitted by the South Atlantic and Gulf of...; shrimp; spiny lobster; and snapper-grouper off the southern Atlantic states are managed under their...

Controlled mass pollination in loblolly pine to increase genetic gains

Treesearch

F.E. Bridgwater; D.L. Bramlett; T.D. Byram; W.J. Lowe

1998-01-01

Controlled mass pollination (CMP) is one way to increase genetic gains from traditional wind-pollinated seed orchards. Methodology is under development by several forestry companies in the southern USA. Costs of CMP depend on the efficient installation, pollination, and removal of inexpensive paper bags. Even in pilot-scale studies these costs seem reasonable. Net...

Enclosed Cutting-And-Polishing Apparatus

NASA Technical Reports Server (NTRS)

Rossier, R. N.; Bicknell, B.

1989-01-01

Proposed apparatus cuts and polishes specimens while preventing contamination of outside environment or of subsequent specimens processed in it. Designed for use in zero gravity but also includes features useful in cutting and polishing of toxic or otherwise hazardous materials on Earth. Includes remote manipulator for handling specimens, cutting and polishing wire, inlets for gas and liquid, and outlets for waste liquid and gas. Replaceable plastic liner surrounds working space.

Evaluation of Skid Resistance of Wearing Course Made Of Stone Mastic Asphalt Mixture in Laboratory Conditions

NASA Astrophysics Data System (ADS)

Wasilewska, Marta

2017-10-01

This paper presents the comparison of skid resistance of wearing course made of SMA (Stone Mastic Asphalt) mixtures which differ in resistance to polishing of coarse aggregate. Dolomite, limestone, granite and trachybasalt were taken for investigation. SMA mixtures have the same nominal size of aggregate (11 mm) and very similar aggregate particle-size distribution in mineral mixtures. Tested SMA11 mixtures were designed according to EN 13108-5 and Polish National Specification WT-2: 2014. Evaluation of the skid resistance has been performed using the FAP (Friction After Polishing) test equipment also known as the Wehner/Schulze machine. Laboratory method enables to compare the skid resistance of different types of mixtures under specified conditions simulating polishing processes. Tests were performed on both the specimens made of each coarse aggregate and SMA11 mixtures containing these aggregates. Measuring of friction coefficient μm was conducted before and during polishing process up to 180 0000 passes of polishing head. Comparison of the results showed differences in sensitivity to polishing among particular mixtures which depend on the petrographic properties of rock used to produce aggregate. Limestone and dolomite tend to have a fairly uniform texture with low hardness which makes these rock types susceptible to rapid polishing. This caused lower coefficient of friction for SMA11 mixtures with limestone and dolomite in comparison with other test mixtures. These significant differences were already registered at the beginning of the polishing process. Limestone aggregate had lower value of μm before starting the process than trachybasalt and granite aggregate after its completion. Despite the differences in structure and mineralogical composition between the granite and trachybasalt, slightly different values of the friction coefficient at the end of polishing were obtained. Images of the surface were taken with the optical microscope for better understanding of the phenomena occurring on the surface of specimen. Results may be valuable information when selecting aggregate to asphalt mixtures at the stage of its design and maintenance of existing road pavements.

Promoting Local Ownership: Lessons Learned from Process of Transitioning Clinical Mentoring of HIV Care and Treatment in Ethiopia.

PubMed

Kassie, Getnet M; Belay, Teklu; Sharma, Anjali; Feleke, Getachew

2018-01-01

Focus on improving access and quality of HIV care and treatment gained acceptance in Ethiopia through the work of the International Training and Education Center for Health. The initiative deployed mobile field-based teams and capacity building teams to mentor health care providers on clinical services and program delivery in three regions, namely Tigray, Amhara, and Afar. Transitioning of the clinical mentoring program (CMP) began in 2012 through capacity building and transfer of skills and knowledge to local health care providers and management. The initiative explored the process of transitioning a CMP on HIV care and treatment to local ownership and documented key lessons learned. A mixed qualitative design was used employing focus group discussions, individual in-depth interviews, and review of secondary data. The participants included regional focal persons, mentors, mentees, multidisciplinary team members, and International Training and Education Center for Health (I-TECH) staff. Three facilities were selected in each region. Data were collected by trained research assistants using customized guides for interviews and with data extraction format. The interviews were recorded and fully transcribed. Open Code software was used for coding and categorizing the data. A total of 16 focus group discussions and 20 individual in-depth interviews were conducted. The critical processes for transitioning a project were: establishment of a mentoring transition task force, development of a roadmap to define steps and directions for implementing the transition, and signing of a memorandum of understanding (MOU) between the respective regional health bureaus and I-TECH Ethiopia to formalize the transition. The elements of implementation included mentorship and capacity building, joint mentoring, supportive supervision, review meetings, and independent mentoring supported by facility-based mechanisms: multidisciplinary team meetings, case-based discussions, and catchment area meetings. The process of transitioning the CMP to local ownership involved signing an MOU, training of mentors, and building capacity of mentoring in each region. The experience shed light on how to transition donor-supported work to local country ownership, with key lessons related to strengthening the structures of regional health bureaus, and other facilities addressing critical issues and ensuring continuity of the facility-based activities.

Minimum area requirements for an at-risk butterfly based on movement and demography.

PubMed

Brown, Leone M; Crone, Elizabeth E

2016-02-01

Determining the minimum area required to sustain populations has a long history in theoretical and conservation biology. Correlative approaches are often used to estimate minimum area requirements (MARs) based on relationships between area and the population size required for persistence or between species' traits and distribution patterns across landscapes. Mechanistic approaches to estimating MAR facilitate prediction across space and time but are few. We used a mechanistic MAR model to determine the critical minimum patch size (CMP) for the Baltimore checkerspot butterfly (Euphydryas phaeton), a locally abundant species in decline along its southern range, and sister to several federally listed species. Our CMP is based on principles of diffusion, where individuals in smaller patches encounter edges and leave with higher probability than those in larger patches, potentially before reproducing. We estimated a CMP for the Baltimore checkerspot of 0.7-1.5 ha, in accordance with trait-based MAR estimates. The diffusion rate on which we based this CMP was broadly similar when estimated at the landscape scale (comparing flight path vs. capture-mark-recapture data), and the estimated population growth rate was consistent with observed site trends. Our mechanistic approach to estimating MAR is appropriate for species whose movement follows a correlated random walk and may be useful where landscape-scale distributions are difficult to assess, but demographic and movement data are obtainable from a single site or the literature. Just as simple estimates of lambda are often used to assess population viability, the principles of diffusion and CMP could provide a starting place for estimating MAR for conservation. © 2015 Society for Conservation Biology.

Redox-active triazatruxene-based conjugated microporous polymers for high-performance supercapacitors† †Electronic supplementary information (ESI) available: Synthetic procedures and characterization data for all new compounds; general experimental method; thermogravimetry curves; PXRD patterns; SEM and TEM images; XPS spectra. See DOI: 10.1039/c6sc05532j Click here for additional data file.

PubMed Central

Li, Xiang-Chun; Zhang, Yizhou; Wang, Chun-Yu; Wan, Yi

2017-01-01

Conjugated polymers (CPs) have been intensively explored for various optoelectronic applications in the last few decades. Nevertheless, CP based electrochemical energy storage devices such as supercapacitors remain largely unexplored. This is mainly owing to the low specific capacitance, poor structural/electrochemical stability, and low energy density of most existing CPs. In this contribution, a novel set of redox-active conjugated microporous polymers, TAT-CMP-1 and TAT-CMP-2, based on nitrogen-rich and highly conductive triazatruxene building blocks, were successfully designed and synthesized to explore their potential application as efficient and stable electrode materials for supercapacitors. Despite a moderate surface area of 88 m2 g–1 for TAT-CMP-1 and 106 m2 g–1 for TAT-CMP-2, exceptional specific capacitances of 141 F g–1 and 183 F g–1 were achieved at a current density of 1 A g–1. The resulting polymers exhibited unusually high areal specific capacitance (>160 μF cm–2), which is attributed to the pseudocapacitance resulting from redox-active structures with high nitrogen content. More importantly, the TAT-CMP-2 electrode exhibits excellent cycling stability: only 5% capacitance fading is observed after 10 000 cycles at a high current density of 10 A g–1, enabling the possible use of these materials as electrodes in electrochemical devices. PMID:28451362

A prime-boost immunization regimen based on a simian adenovirus 36 vectored multi-stage malaria vaccine induces protective immunity in mice.

PubMed

Fonseca, Jairo A; McCaffery, Jessica N; Kashentseva, Elena; Singh, Balwan; Dmitriev, Igor P; Curiel, David T; Moreno, Alberto

2017-05-31

Malaria remains a considerable burden on public health. In 2015, the WHO estimates there were 212 million malaria cases causing nearly 429,000 deaths globally. A highly effective malaria vaccine is needed to reduce the burden of this disease. We have developed an experimental vaccine candidate (PyCMP) based on pre-erythrocytic (CSP) and erythrocytic (MSP1) stage antigens derived from the rodent malaria parasite P. yoelii. Our protein-based vaccine construct induces protective antibodies and CD4 + T cell responses. Based on evidence that viral vectors increase CD8 + T cell-mediated immunity, we also have tested heterologous prime-boost immunization regimens that included human adenovirus serotype 5 vector (Ad5), obtaining protective CD8 + T cell responses. While Ad5 is commonly used for vaccine studies, the high prevalence of pre-existing immunity to Ad5 severely compromises its utility. Here, we report the use of the novel simian adenovirus 36 (SAd36) as a candidate for a vectored malaria vaccine since this virus is not known to infect humans, and it is not neutralized by anti-Ad5 antibodies. Our study shows that the recombinant SAd36PyCMP can enhance specific CD8 + T cell response and elicit similar antibody titers when compared to an immunization regimen including the recombinant Ad5PyCMP. The robust immune responses induced by SAd36PyCMP are translated into a lower parasite load following P. yoelii infectious challenge when compared to mice immunized with Ad5PyCMP. Copyright © 2017 Elsevier Ltd. All rights reserved.

Influence of apical enlargement and complementary canal preparation with the Self-Adjusting File on endotoxin reduction in retreatment cases.

PubMed

Silva, E J N L; Ferreira, V M; Silva, C C; Herrera, D R; De-Deus, G; Gomes, B P

2017-07-01

To compare the effectiveness of large apical preparations and complementary canal preparation with the Self-Adjusting File (SAF) in removing endotoxins from the root canal of teeth with apical periodontitis. Ten single-rooted and single-canaled teeth with post-treatment apical periodontitis were selected. Endotoxin samples were taken after removal of the root filling (S1), after chemomechanical preparation (CMP) using 2.5% NaOCl and an R25 file (S2), after CMP using 2.5% NaOCl and an R40 file (S3) and after complementary CMP using the SAF system (S4). Limulus amebocyte lysate (LAL) was used to measure endotoxin levels. The Friedman and Wilcoxon tests were used to compare endotoxin levels at each clinical intervention (P < 0.05). After root filling removal, endotoxin was detected in 100% of the root canals (S1, 4.84 EU mL -1 ). CMP with the R25 file was able to significantly reduce endotoxin levels (P < 0.05). Increased levels of endotoxin removal were achieved by apical preparation with the R40 file (P < 0.05). Complementary CMP with SAF did not significantly reduce endotoxin levels (P > 0.05) following the use of the R40 instrument. Apical enlargement protocols were effective in significantly reducing endotoxin levels. Complementary preparation with the SAF system failed to eliminate residual endotoxin contents beyond those obtained with the R40 instrument. © 2016 International Endodontic Journal. Published by John Wiley & Sons Ltd.

The Community Mentorship Program: Providing Community-Engagement Opportunities for Early-Stage Clinical and Translational Scientists to Facilitate Research Translation.

PubMed

Patino, Cecilia M; Kubicek, Katrina; Robles, Marisela; Kiger, Holly; Dzekov, Jeanne

2017-02-01

A goal of the Southern California Clinical and Translational Science Institute (SC-CTSI) at the University of Southern California and Children's Hospital Los Angeles is to train early-stage clinical and translational scientists (CTSs) to conduct research that improves the health of diverse communities. This goal aligns well with the Institute of Medicine's recommendations emphasizing community engagement in biomedical research that facilitates research translation. The Community Mentorship Program (CMP), created to complement community-engaged research didactics, matches CTSs with community mentors who help them identify and complete community-engaged experiences that inform their research. The CMP was piloted in 2013-2015 by the SC-CTSI Workforce Development and Community Engagement cores. The CMP team matched three CTSs (assistant professors pursuing mentored career development awards) with mentors at community-based organizations (CBOs) aligned with their research interests. Each mentor-mentee pair signed a memorandum of understanding. The CMP team checked in regularly, monitoring progress and addressing challenges in CTSs' completion of their community-engaged experience. Each pair completed at least one community-engaged activity informing the CTS's research. In exit interviews, the CTSs and CBO mentors expressed satisfaction with the program and stated that they would continue to work together. The CTSs reported that the program provided opportunities to develop networks outside academia, build trust within the community, and receive feedback and learn from individuals in communities affected by their research. The CMP will be expanded to include all eligible early-career CTSs and promoted for use in similar settings outside the SC-CTSI.

A study of material removal during magnetorheological finishing. 1998 summer research program for high school juniors at the Univ. of Rochester`s Laboratory for Laser Energetics: Student research reports

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hubregsen, J.

1999-03-01

In the process of optical polishing, a new method has been developed called Magnetorheological Finishing, or MRF. This process utilizes both mechanical and chemical effects to remove material during polishing. To more fully understand the fundamental mechanisms of MR polishing the authors have successfully separated mechanical scratching from chemical softening in glass polishing with MRF by removing the water from the MR fluid. The addition of water initiates the chemical effects by hydrating the glass surface and changing the amplitude of the scratches. In addition, this study has found that the mechanical removal by scratching is related to the hardnessmore » of the magnetic carbonyl iron particles, and the hardness and type of the glass being polished.« less

Variation in the Use of Federal and State Civil Money Penalties for Nursing Homes

ERIC Educational Resources Information Center

Harrington, Charlene; Tsoukalas, Theodore; Rudder, Cynthia; Mollot, Richard J.; Carrillo, Helen

2008-01-01

Purpose: The study examined factors associated with state variations in the use of federal and state civil money penalties (CMPs) for nursing homes. Design and Methods: We collected federal and state CMP data from state survey and certification agencies for 2004. We also used federal CMP data from the federal enforcement action database for…

An Injectable Enzymatically Crosslinked Carboxymethylated Pullulan/Chondroitin Sulfate Hydrogel for Cartilage Tissue Engineering

PubMed Central

Chen, Feng; Yu, Songrui; Liu, Bing; Ni, Yunzhou; Yu, Chunyang; Su, Yue; Zhu, Xinyuan; Yu, Xiaowei; Zhou, Yongfeng; Yan, Deyue

2016-01-01

In this study, an enzymatically cross-linked injectable and biodegradable hydrogel system comprising carboxymethyl pullulan-tyramine (CMP-TA) and chondroitin sulfate-tyramine (CS-TA) conjugates was successfully developed under physiological conditions in the presence of both horseradish peroxidase (HRP) and hydrogen peroxide (H2O2) for cartilage tissue engineering (CTTE). The HRP crosslinking method makes this injectable system feasible, minimally invasive and easily translatable for regenerative medicine applications. The physicochemical properties of the mechanically stable hydrogel system can be modulated by varying the weight ratio and concentration of polymer as well as the concentrations of crosslinking reagents. Additionally, the cellular behaviour of porcine auricular chondrocytes encapsulated into CMP-TA/CS-TA hydrogels demonstrates that the hydrogel system has a good cyto-compatibility. Specifically, compared to the CMP-TA hydrogel, these CMP-TA/CS-TA composite hydrogels have enhanced cell proliferation and increased cartilaginous ECM deposition, which significantly facilitate chondrogenesis. Furthermore, histological analysis indicates that the hydrogel system exhibits acceptable tissue compatibility by using a mouse subcutaneous implantation model. Overall, the novel injectable pullulan/chondroitin sulfate composite hydrogels presented here are expected to be useful biomaterial scaffold for regenerating cartilage tissue. PMID:26817622

Surfactant assisted disperser pretreatment on the liquefaction of Ulva reticulata and evaluation of biodegradability for energy efficient biofuel production through nonlinear regression modelling.

PubMed

Kumar, M Dinesh; Tamilarasan, K; Kaliappan, S; Banu, J Rajesh; Rajkumar, M; Kim, Sang Hyoun

2018-05-01

The present study aimed to increase the disintegration potential of marine macroalgae, (Ulva reticulata) through chemo mechanical pretreatment (CMP) in an energy efficient manner. By combining surfactant with disperser, the specific energy input was considerably reduced from 437.1 kJ/kg TS to 264.9 kJ/kg TS to achieve 10.7% liquefaction. A disperser rpm (10,000), pretreatment time (30 min) and tween 80 dosage (21.6 mg/L) were considered as an optimum for effective liquefaction of algal biomass. CMP was designated as an appropriate pretreatment resulting in a higher soluble organic release 1250 mg/L, respectively. Anaerobic fermentation results revealed that the volatile fatty acid (VFA) concentration was doubled (782 mg/L) in CMP when compared to mechanical pretreatment (MP) (345 mg/L). CMP pretreated algal biomass was considered as the suitable for biohydrogen production with highest H 2 yield of about 63 mL H 2 /g COD than (MP) (45 mL H 2 /g COD) and control (10 mL H 2 /g COD). Copyright © 2018 Elsevier Ltd. All rights reserved.

Association of Calf Muscle Pump Stimulation With Sleep Quality in Adults.

PubMed

Baniak, Lynn M; Pierce, Carolyn S; McLeod, Kenneth J; Chasens, Eileen R

2016-12-01

Prevention of lower extremity fluid pooling (LEFP) is associated with improved sleep quality. Physical activity and compression stockings are non-invasive methods used to manage LEFP, but both are associated with low adherence. Calf muscle pump (CMP) stimulation is an alternative and more convenient approach. Convenience sampling was used to recruit 11 participants between ages 45 and 65 with poor sleep quality. A within-person single-group pre-test-post-test design was used to evaluate changes in sleep quality, daytime sleepiness, and functional outcomes sensitive to impaired sleep as measured by the Pittsburgh Sleep Quality Index (PSQI), Functional Outcomes of Sleep Questionnaire, and Epworth Sleepiness Scale after 4 weeks of CMP stimulation. Statistical analysis included effect size (ES) calculations. After daily use of CMP stimulation, participants demonstrated improvement in overall sleep quality (ES = -.97) and a large reduction in daily disturbance from poor sleep (ES = -1.25). Moderate improvements were observed in daytime sleepiness (ES = -.53) and functional outcomes sensitive to sleepiness (ES = .49). Although causality could not be determined with this study design, these results support further research to determine whether CMP stimulation can improve sleep quality. © 2016 Wiley Periodicals, Inc. © 2016 Wiley Periodicals, Inc.

An Injectable Enzymatically Crosslinked Carboxymethylated Pullulan/Chondroitin Sulfate Hydrogel for Cartilage Tissue Engineering

NASA Astrophysics Data System (ADS)

Chen, Feng; Yu, Songrui; Liu, Bing; Ni, Yunzhou; Yu, Chunyang; Su, Yue; Zhu, Xinyuan; Yu, Xiaowei; Zhou, Yongfeng; Yan, Deyue

2016-01-01

In this study, an enzymatically cross-linked injectable and biodegradable hydrogel system comprising carboxymethyl pullulan-tyramine (CMP-TA) and chondroitin sulfate-tyramine (CS-TA) conjugates was successfully developed under physiological conditions in the presence of both horseradish peroxidase (HRP) and hydrogen peroxide (H2O2) for cartilage tissue engineering (CTTE). The HRP crosslinking method makes this injectable system feasible, minimally invasive and easily translatable for regenerative medicine applications. The physicochemical properties of the mechanically stable hydrogel system can be modulated by varying the weight ratio and concentration of polymer as well as the concentrations of crosslinking reagents. Additionally, the cellular behaviour of porcine auricular chondrocytes encapsulated into CMP-TA/CS-TA hydrogels demonstrates that the hydrogel system has a good cyto-compatibility. Specifically, compared to the CMP-TA hydrogel, these CMP-TA/CS-TA composite hydrogels have enhanced cell proliferation and increased cartilaginous ECM deposition, which significantly facilitate chondrogenesis. Furthermore, histological analysis indicates that the hydrogel system exhibits acceptable tissue compatibility by using a mouse subcutaneous implantation model. Overall, the novel injectable pullulan/chondroitin sulfate composite hydrogels presented here are expected to be useful biomaterial scaffold for regenerating cartilage tissue.

Enhanced degradation and mineralization of 4-chloro-3-methyl phenol by Zn-CNTs/O3 system.

PubMed

Liu, Yong; Zhou, Anlan; Liu, Yanlan; Wang, Jianlong

2018-01-01

A novel zinc-carbon nanotubes (Zn-CNTs) composite was prepared, characterized and used in O 3 system for the enhanced degradation and mineralization of chlorinated phenol. The Zn-CNTs was characterized by SEM, BET and XRD, and the degradation of 4-chloro-3-methyl phenol (CMP) in aqueous solution was investigated using Zn-CNTs/O 3 system. The experimental results showed that the rate constant of total organic carbon (TOC) removal was 0.29 min -1 , much higher than that of only O 3 system (0.059 min -1 ) because Zn-CNTs/O 2 system could generate H 2 O 2 in situ, the concentration of H 2 O 2 could reach 156.14 mg/L within 60 min at pH 6.0. The high mineralization ratio of CMP by Zn-CNTs/O 3 occurred at wide pH range (3.0-9.0). The increase of Zn-CNTs dosage or gas flow rate contributed to the enhancement of CMP mineralization. The intermediates of CMP degradation were identified and the possible degradation pathway was tentatively proposed. Copyright © 2017 Elsevier Ltd. All rights reserved.

Fabrication of controllably variable sub-100  nm gaps in silver nanowires by photothermal-induced stress.

PubMed

Ghosh, Pintu; Lu, Jinsheng; Luo, Hao; Xu, Ziquan; Yan, Xiaoyuan; Wang, Yewu; Lu, Jun; Qiu, Min; Li, Qiang

2018-05-15

A technique to fabricate nanogaps with controllably variable gap width in silver (Ag) nanowires (NWs) by photothermal-induced stress utilizing a focused continuous-wave laser (532 nm) is presented. For the case of an Ag NW on gold thin film, a gap width starting from ∼20  nm is achieved with a critical minimum power (CMP) of about 160 mW, whereas in the case of an Ag NW placed on top of a zinc oxide NW, the attained gap width is as small as a few nm (<10  nm) with a CMP of only ∼100  mW. In both cases, the CMP is much lower as compared to the required CMP (∼280  mW) for an Ag NW placed on a bare silica substrate. The photothermal-induced stress combined with Rayleigh instability, melting, and sublimation of Ag aids in breaking the Ag NW. In particular, the former one plays a key role in attaining an extremely narrow gap. This technique to fabricate sub-100 nm nanogaps in metal NWs can be extensively implemented in fabrication and maintenance of nanomechanical, nanoplasmonic, and nanoelectronic devices.

Characterising the development of the understanding of human body systems in high-school biology students - a longitudinal study

NASA Astrophysics Data System (ADS)

Snapir, Zohar; Eberbach, Catherine; Ben-Zvi-Assaraf, Orit; Hmelo-Silver, Cindy; Tripto, Jaklin

2017-10-01

Science education today has become increasingly focused on research into complex natural, social and technological systems. In this study, we examined the development of high-school biology students' systems understanding of the human body, in a three-year longitudinal study. The development of the students' system understanding was evaluated using the Components Mechanisms Phenomena (CMP) framework for conceptual representation. We coded and analysed the repertory grid personal constructs of 67 high-school biology students at 4 points throughout the study. Our data analysis builds on the assumption that systems understanding entails a perception of all the system categories, including structures within the system (its Components), specific processes and interactions at the macro and micro levels (Mechanisms), and the Phenomena that present the macro scale of processes and patterns within a system. Our findings suggest that as the learning process progressed, the systems understanding of our students became more advanced, moving forward within each of the major CMP categories. Moreover, there was an increase in the mechanism complexity presented by the students, manifested by more students describing mechanisms at the molecular level. Thus, the 'mechanism' category and the micro level are critical components that enable students to understand system-level phenomena such as homeostasis.

Medicare program; contracts with health maintenance organizations (HMOs) and competitive medical plans (CMPs)--HCFA. Final rule with comment period.

PubMed

1995-09-01

This rule clarifies and updates portions of the HCFA regulations that pertain to the following: The conditions that an HMO or CMP must meet to qualify for a Medicare contract (Subpart J). The contract requirements (Subpart L). The rules for enrollment, entitlement, and disenrollment of Medicare beneficiaries in a contracting HMO or CMP (Subpart K). How a Medicare contract is affected when there is change of ownership or leasing of facilities of a contracting HMO or CMP (Subpart M). These are technical and editorial changes that do not affect the substance of the regulations. They are intended to make it easier to find particular provisions, to provide overviews of the different program aspects, and to better ensure uniform understanding of the rules.

Cow's milk allergy: where have we come from and where are we going?

PubMed

Host, Arne; Halken, Susanne

2014-03-01

Since the 1930's the scientific literature on cow's milk protein allergy (CMPA) has accumulated. Over the last decade new diagnostic tools and treatment approaches have been developed. The diagnosis of reproducible adverse reactions to cow's milk proteins (CMP), i.e. CMPA, still has to be confirmed by controlled elimination and challenge procedures. Advanced diagnostic testing using epitope and microarray technology may in the future improve the diagnostic accuracy of CMPA by determination of specific IgE against specific allergen components of cow's milk protein. The incidence of CMPA in early childhood is approximately 2-3% in developed countries. Symptoms suggestive of CMPA may be encountered in 5-15% of infants emphasizing the importance of controlled elimination/milk challenge procedures. Reproducible clinical reactions to CMP in human milk have been reported in 0.5% of breastfed infants. Most infants with CMPA develop symptoms before 1 month of age, often within 1 week after inter introduction of CMP-based formula. The majority has two or more symptoms from two or more organ systems. Approximately 50-70% have cutaneous symptoms, 50-60% gastrointestinal symptoms and 20-30% respiratory symptoms. Symptoms may occur within 1 hour after milk intake (immediate reactions) or after 1 hour (late reactions). The prognosis of CMPA is good with a remission rate of approximately 45 to 50% at 1 year, 60 to 75% at 2 years and 85 to 90% at 3 years. Associated adverse reactions to other foods develop in up to 50% and allergy against inhalants in 50 to 80%. The basic treatment of CMPA is avoidance of CMP. In early childhood a milk substitute is needed. Documented extensively hydrolysed formulas are recommended, whereas partially hydrolysed formulas should not be used because of a high degree of antigenicity and allergenicity associated with adverse reactions. In case of intolerance to extensively hydrolysed formulas and multiple food allergies a formula based on aminoacids is recommended. Alternative milk substitutes such as sheep's and goat's milk should not be used because of a high degree of cross reactivity with CMP. Milk from other mammals such as mare and donkey may be tolerated by some children with CMPA. Soy protein is as allergenic as CMP and soy formula is not recommended for young children with CMPA because of a great risk of development of allergy to soy, whereas soymilk is normally tolerated in older children with CMPA. Recent treatment modalities are oral immunotherapy (OIT) involving the ingestion of increasing amounts of milk allergen on a regular basis to desensitize and potentially permanently tolerize patients to CMP. OIT can increase the reaction thresholds to CMP, but questions about safety and long-term efficacy remain. Anti-IgE therapy with Omalizumab may improve the safety and efficacy of OIT and may provide benefit in monotherapy.

Polishing parameter optimization for end-surface of chalcogenide glass fiber connector

NASA Astrophysics Data System (ADS)

Guo, Fangxia; Dai, Shixun; Tang, Junzhou; Wang, Xunsi; Li, Xing; Xu, Yinsheng; Wu, Yuehao; Liu, Zijun

2017-11-01

We have investigated the optimization parameters for polishing end-surface of chalcogenide glass fiber connector in the paper. Six SiC abrasive particles of different sizes were used to polish the fiber in order of size from large to small. We analyzed the effects of polishing parameters such as particle sizes, grinding speeds and polishing durations on the quality of the fiber end surface and determined the optimized polishing parameters. We found that, high-quality fiber end surface can be achieved using only three different SiC abrasives. The surface roughness of the final ChG fiber end surface is about 48 nm without any scratches, spots and cracks. Such polishing processes could reduce the average insertion loss of the connector to about 3.4 dB.

Development of a Computer-Controlled Polishing Process for X-Ray Optics

NASA Technical Reports Server (NTRS)

Khan, Gufran S.; Gubarev, Mikhail; Arnold, William; Ramsey, Brian

2009-01-01

The future X-ray observatory missions require grazing-incidence x-ray optics with angular resolution of < 5 arcsec half-power diameter. The achievable resolution depends ultimately on the quality of polished mandrels from which the shells are replicated. With an aim to fabricate better shells, and reduce the cost/time of mandrel production, a computer-controlled polishing machine is developed for deterministic and localized polishing of mandrels. Cylindrical polishing software is also developed that predicts the surface residual errors under a given set of operating parameters and lap configuration. Design considerations of the polishing lap are discussed and the effects of nonconformance of the lap and the mandrel are presented.

Effect of polishing process on corrosion behavior of 308L stainless steel in high temperature water

NASA Astrophysics Data System (ADS)

Ma, Cheng; Han, En-Hou; Peng, Qunjia; Ke, Wei

2018-06-01

Effect of change in surface composition and roughness by different polishing processes on corrosion of 308L stainless steel in high temperature water was investigated. The investigation was conducted by comparing the corrosion behavior of electropolished specimens with that of the 40 nm-colloidal silica slurry polished specimens. The result revealed that the electropolished specimens had a higher corrosion rate than the colloidal silica slurry polished specimens, which was attributed to formation of an amount of chromium hydroxide and higher roughness of the electropolished surface. Moreover, the ferrite in 308L stainless steel was found to have a higher resistance to corrosion than the austenite matrix.

Three-Dimensional Vibration Isolator for Suppressing High-Frequency Responses for Sage III Contamination Monitoring Package (CMP)

NASA Technical Reports Server (NTRS)

Li, Y.; Cutright, S.; Dyke, R.; Templeton, J.; Gasbarre, J.; Novak, F.

2015-01-01

The Stratospheric Aerosol and Gas Experiment (SAGE) III - International Space Station (ISS) instrument will be used to study ozone, providing global, long-term measurements of key components of the Earth's atmosphere for the continued health of Earth and its inhabitants. SAGE III is launched into orbit in an inverted configuration on SpaceX;s Falcon 9 launch vehicle. As one of its four supporting elements, a Contamination Monitoring Package (CMP) mounted to the top panel of the Interface Adapter Module (IAM) box experiences high-frequency response due to structural coupling between the two structures during the SpaceX launch. These vibrations, which were initially observed in the IAM Engineering Development Unit (EDU) test and later verified through finite element analysis (FEA) for the SpaceX launch loads, may damage the internal electronic cards and the Thermoelectric Quartz Crystal Microbalance (TQCM) sensors mounted on the CMP. Three-dimensional (3D) vibration isolators were required to be inserted between the CMP and IAM interface in order to attenuate the high frequency vibrations without resulting in any major changes to the existing system. Wire rope isolators were proposed as the isolation system between the CMP and IAM due to the low impact to design. Most 3D isolation systems are designed for compression and roll, therefore little dynamic data was available for using wire rope isolators in an inverted or tension configuration. From the isolator FEA and test results, it is shown that by using the 3D wire rope isolators, the CMP high-frequency responses have been suppressed by several orders of magnitude over a wide excitation frequency range. Consequently, the TQCM sensor responses are well below their qualification environments. It is indicated that these high-frequency responses due to the typical instrument structural coupling can be significantly suppressed by a vibration passive control using the 3D vibration isolator. Thermal and contamination issues were also examined during the isolator selection period for meeting the SAGE III-ISS instrument requirements.

Investigation of contact pressure and influence function model for soft wheel polishing.

PubMed

Rao, Zhimin; Guo, Bing; Zhao, Qingliang

2015-09-20

The tool influence function (TIF) is critical for calculating the dwell-time map to improve form accuracy. We present the TIF for the process of computer-controlled polishing with a soft polishing wheel. In this paper, the static TIF was developed based on the Preston equation. The pressure distribution was verified by the real removal spot section profiles. According to the experiment measurements, the pressure distribution simulated by Hertz contact theory was much larger than the real contact pressure. The simulated pressure distribution, which was modeled by the Winkler elastic foundation for a soft polishing wheel, matched the real contact pressure. A series of experiments was conducted to obtain the removal spot statistical properties for validating the relationship between material removal and processing time and contact pressure and relative velocity, along with calculating the fitted parameters to establish the TIF. The developed TIF predicted the removal character for the studied soft wheel polishing.

Removal rate model for magnetorheological finishing of glass.

PubMed

Degroote, Jessica E; Marino, Anne E; Wilson, John P; Bishop, Amy L; Lambropoulos, John C; Jacobs, Stephen D

2007-11-10

Magnetorheological finishing (MRF) is a deterministic subaperture polishing process. The process uses a magnetorheological (MR) fluid that consists of micrometer-sized, spherical, magnetic carbonyl iron (CI) particles, nonmagnetic polishing abrasives, water, and stabilizers. Material removal occurs when the CI and nonmagnetic polishing abrasives shear material off the surface being polished. We introduce a new MRF material removal rate model for glass. This model contains terms for the near surface mechanical properties of glass, drag force, polishing abrasive size and concentration, chemical durability of the glass, MR fluid pH, and the glass composition. We introduce quantitative chemical predictors for the first time, to the best of our knowledge, into an MRF removal rate model. We validate individual terms in our model separately and then combine all of the terms to show the whole MRF material removal model compared with experimental data. All of our experimental data were obtained using nanodiamond MR fluids and a set of six optical glasses.

Electrochemical and mechanical polishing and shaping method and system

NASA Technical Reports Server (NTRS)

Engelhaupt, Darell E. (Inventor); Gubarev, Mikhail V. (Inventor); Jones, William David (Inventor); Ramsey, Brian D. (Inventor); Benson, Carl M. (Inventor)

2011-01-01

A method and system are provided for the shaping and polishing of the surface of a material selected from the group consisting of electrically semi-conductive materials and conductive materials. An electrically non-conductive polishing lap incorporates a conductive electrode such that, when the polishing lap is placed on the material's surface, the electrode is placed in spaced-apart juxtaposition with respect to the material's surface. A liquid electrolyte is disposed between the material's surface and the electrode. The electrolyte has an electrochemical stability constant such that cathodic material deposition on the electrode is not supported when a current flows through the electrode, the electrolyte and the material. As the polishing lap and the material surface experience relative movement, current flows through the electrode based on (i) adherence to Faraday's Law, and (ii) a pre-processing profile of the surface and a desired post-processing profile of the surface.

Investigating the dynamics of the surface roughness of BK7 and TF1 glasses when they are processed by surface lap

NASA Astrophysics Data System (ADS)

Obeid, A.

2005-12-01

The roughness dynamics of glasses of types BK7 (K8) and TF1 are investigated at the stage of grinding and polishing when they undergo free-lap processing. The relationship is established between the arithmetic-mean roughness and the abrasive graininess at the stage of grinding and the polishing time. It is shown that one can distinguish three stages in the formation of roughness during polishing.

Adapting services to the needs of children and families with complex migration experiences: The Toulouse University Hospital's intercultural consultation.

PubMed

Sturm, Gesine; Guerraoui, Zohra; Bonnet, Sylvie; Gouzvinski, Françoise; Raynaud, Jean-Philippe

2017-08-01

This article presents the recently created intercultural consultation at the Medical and Psychological Health Care Service (CMP) of the University Hospital la Grave at Toulouse. The approach of the intercultural consultation was elaborated in response to the increasing diversity of children and families using the service in Toulouse. It is also based on local research that indicates the difficulties service providers encounter when trying to establish a solid therapeutic alliance with families with complex migration backgrounds who accumulate different disadvantaging factors. The intercultural consultation adapts existing models of culture-sensitive consultations in child mental health care in France and Canada to the local context in Toulouse. We describe the underlying principles of the intercultural consultation work, the therapeutic and mediation techniques used, and the way the work is integrated into the global service provision of the CMP. The process is illustrated with a case study followed by a discussion of the innovations.

Cryogenic Information Center

NASA Technical Reports Server (NTRS)

Mohling, Robert A.; Marquardt, Eric D.; Fusilier, Fred C.; Fesmire, James E.

2003-01-01

The Cryogenic Information Center (CIC) is a not-for-profit corporation dedicated to preserving and distributing cryogenic information to government, industry, and academia. The heart of the CIC is a uniform source of cryogenic data including analyses, design, materials and processes, and test information traceable back to the Cryogenic Data Center of the former National Bureau of Standards. The electronic database is a national treasure containing over 146,000 specific bibliographic citations of cryogenic literature and thermophysical property data dating back to 1829. A new technical/bibliographic inquiry service can perform searches and technical analyses. The Cryogenic Material Properties (CMP) Program consists of computer codes using empirical equations to determine thermophysical material properties with emphasis on the 4-300K range. CMP's objective is to develop a user-friendly standard material property database using the best available data so government and industry can conduct more accurate analyses. The CIC serves to benefit researchers, engineers, and technologists in cryogenics and cryogenic engineering, whether they are new or experienced in the field.

Structure-based Mechanism of CMP-2-keto-3-deoxymanno-octulonic Acid Synthetase

PubMed Central

Heyes, Derren J.; Levy, Colin; Lafite, Pierre; Roberts, Ian S.; Goldrick, Marie; Stachulski, Andrew V.; Rossington, Steven B.; Stanford, Deborah; Rigby, Stephen E. J.; Scrutton, Nigel S.; Leys, David

2009-01-01

The enzyme CMP-Kdo synthetase (KdsB) catalyzes the addition of 2-keto-3-deoxymanno-octulonic acid (Kdo) to CTP to form CMP-Kdo, a key reaction in the biosynthesis of lipopolysaccharide. The reaction catalyzed by KdsB and the related CMP-acylneuraminate synthase is unique among the sugar-activating enzymes in that the respective sugars are directly coupled to a cytosine monophosphate. Using inhibition studies, in combination with isothermal calorimetry, we show the substrate analogue 2β-deoxy-Kdo to be a potent competitive inhibitor. The ligand-free Escherichia coli KdsB and ternary complex KdsB-CTP-2β-deoxy-Kdo crystal structures reveal that Kdo binding leads to active site closure and repositioning of the CTP phosphates and associated Mg2+ ion (Mg-B). Both ligands occupy conformations compatible with an Sn2-type attack on the α-phosphate by the Kdo 2-hydroxyl group. Based on strong similarity with DNA/RNA polymerases, both in terms of overall chemistry catalyzed as well as active site configuration, we postulate a second Mg2+ ion (Mg-A) is bound by the catalytically competent KdsB-CTP-Kdo ternary complex. Modeling of this complex reveals the Mg-A coordinated to the conserved Asp100 and Asp235 in addition to the CTP α-phosphate and both the Kdo carboxylic and 2-hydroxyl groups. EPR measurements on the Mn2+-substituted ternary complex support this model. We propose the KdsB/CNS sugar-activating enzymes catalyze the formation of activated sugars, such as the abundant CMP-5-N-acetylneuraminic acid, by recruitment of two Mg2+ to the active site. Although each metal ion assists in correct positioning of the substrates and activation of the α-phosphate, Mg-A is responsible for activation of the sugar-hydroxyl group. PMID:19815542

Estimating Temporal Redistribution of Surface Melt Water into Upper Stratigraphy of the Juneau Icefield, Alaska

NASA Astrophysics Data System (ADS)

Wilner, J.; Smith, B.; Moore, T.; Campbell, S. W.; Slavin, B. V.; Hollander, J.; Wolf, J.

2015-12-01

The redistribution of winter accumulation from surface melt into firn or deeper layers (i.e. internal accumulation) remains a poorly understood component of glacier mass balance. Winter accumulation is usually quantified prior to summer melt, however the time window between accumulation and the onset of melt is minimal so this is not always possible. Studies which are initiated following the onset of summer melt either neglect sources of internal accumulation or attempt to estimate melt (and therefore winter accumulation uncertainty) through a variety of modeling methods. Here, we used ground-penetrating radar (GPR) repeat common midpoint (CMP) surveys with supporting common offset surveys, mass balance snow pits, and probing to estimate temporal changes in water content within the winter accumulation and firn layers of the southern Juneau Icefield, Alaska. In temperate glaciers, radio-wave velocity is primarily dependent on water content and snow or firn density. We assume density changes are temporally slow relative to water flow through the snow and firn pack, and therefore infer that changing radio-wave velocities measured by successive CMP surveys result from flux in surface melt through deeper layers. Preliminary CMP data yield radio-wave velocities of 0.15 to 0.2 m/ns in snowpack densities averaging 0.56 g cm-3, indicating partially to fully saturated snowpack (4-9% water content). Further spatial-temporal analysis of CMP surveys is being conducted. We recommend that repeat CMP surveys be conducted over a longer time frame to estimate stratigraphic water redistribution between the end of winter accumulation and maximum melt season. This information could be incorporated into surface energy balance models to further understanding of the influence of internal accumulation on glacier mass balance.

Mineral materials as feasible amendments to stabilize heavy metals in polluted urban soils.

PubMed

Zhang, Mingkui; Pu, Jincheng

2011-01-01

Four minerals, agricultural limestone (AL), rock phosphate (RP), palygorskite (PG), and calcium magnesium phosphate (CMP), were evaluated by means of chemical fractions of heavy metals in soils and concentrations of heavy metals in leachates from columns to determine their ability to stabilize heavy metals in polluted urban soils. Two urban soils (calcareous soil and acidic soil) polluted with cadmium, copper, zinc and lead were selected and amended in the laboratory with the mineral materials) for 12 months. Results indicated that application of the mineral materials reduced exchangeable metals in the sequence of Pb, Cd > Cu > Zn. The reduction of exchangeable fraction of heavy metals in the soils amended with different mineral materials followed the sequence of CMP, PG > AL > RP. Reductions of heavy metals leached were based on comparison with cumulative totals of heavy metals eluted through 12 pore volumes from an untreated soil. The reductions of the metals eluted from the calcareous soil amended with the RP, AL, PG and CMP were 1.98%, 38.89%, 64.81% and 75.93% for Cd, 8.51%, 40.42%, 60.64% and 55.32% for Cu, 1.76%, 52.94%, 70.00% and 74.12% for Pb, and 28.42%, 52.74%, 64.38% and 49.66% for Zn. Those from the acidic soil amended with the CMP, PG, AL, and RP were 25.65%, 68.06%, 78.01% and 79.06% for Cd, 26.56%, 49.64%, 43.40% and 34.68% for Cu, 44.44%, 33.32%, 61.11% and 69.44% for Pb, and 18.46%, 43.77%, 41.98% and 40.68% for Zn. The CMP and PG treatments were superior to the AL and RP for stabilizing heavy metals in the polluted urban soils.

The Community Mentorship Program: Providing Community-Engagement Opportunities for Early-Stage Clinical and Translational Scientists to Facilitate Research Translation

PubMed Central

Patino, Cecilia M.; Kubicek, Katrina; Robles, Marisela; Kiger, Holly; Dzekov, Jeanne

2016-01-01

Problem A goal of the Southern California Clinical and Translational Science Institute (SC-CTSI) at the University of Southern California (USC) and Children's Hospital Los Angeles is to train early-stage clinical translational scientists (CTSs) to conduct research that improves the health of diverse communities. This goal aligns well with the Institute of Medicine's recommendations emphasizing community engagement in biomedical research that facilitates research translation. The Community Mentorship Program (CMP), created to complement community-engaged research (CER) didactics, matches CTSs with community mentors who help CTSs identify and complete community-engaged experiences that inform their research. Approach The CMP was piloted in 2013-2015 by the SC-CTSI Workforce Development and Community-Engagement cores. The CMP team matched three CTSs (assistant professors pursuing mentored career development awards, two with CER experience) with mentors at community-based organizations (CBOs) aligned with their research interests. Each mentor–mentee pair signed a memorandum of understanding. The CMP team checked in regularly, monitoring progress and addressing challenges in CTSs’ completion of their community-engaged experience. Outcomes All pairs completed at least one community-engaged activity informing the CTS's research. In exit interviews, the CTSs and CBO mentors expressed satisfaction with the program and stated they would continue to work together. The CTSs reported the program provided opportunities to develop networks outside academia, build trust within the community, and receive feedback and learn from individuals in communities affected by their research. Next Steps The CMP will be expanded to include all eligible early-career CTSs and promoted for use in similar settings outside the SC-CTSI. PMID:27508342

Oral delivery of Brucella spp. recombinant protein U-Omp16 abrogates the IgE-mediated milk allergy.

PubMed

Smaldini, Paola Lorena; Ibañez, Andrés Esteban; Fossati, Carlos Alberto; Cassataro, Juliana; Docena, Guillermo Horacio

2014-01-01

Food allergies are increasingly common disorders and no therapeutic strategies are yet approved. The unlipidated Omp16 (U-Omp16) is the outer membrane protein of 16 kDa from B. abortus and possesses a mucosal adjuvant property. In this study, we aimed to examine the U-Omp16 capacity to abrogate an allergen-specific Th2 immune response when it is administered as an oral adjuvant in a mouse model of food allergy.   Balb/c mice were sensitized with cholera toxin and cow's milk proteins (CMP) by gavage and simultaneously treated with U-Omp16 and CMP. Oral challenge with CMP was performed to evaluate the allergic status of mice. Symptoms, local (small bowel cytokine and transcription factor gene expression) and systemic (specific isotypes and spleen cell-secreted cytokines) parameters, and skin tests were done to evaluate the immune response. We found that the oral administration of U-Omp16 with CMP during sensitization dampened the allergic symptoms, with negativization of immediate skin test and increased skin DTH response. Serum specific IgE and IL-5 were inhibited and a Th1 response was promoted (specific IgG2a antibodies and CMP-induced IFN-γ secretion). We found at the mucosal site an inhibition of the gene expression corresponding to IL-13 and Gata-3, with an induction of IFN-γ and T-bet. These results indicated that the oral administration of U-Omp16 significantly controlled the allergic response in sensitized mice with a shift of the balance of Th1- and Th2-T cells toward Th1 predominance. These findings suggest that U-Omp16 may be useful as a Th1-directing adjuvant in an oral vaccine.

Oral delivery of Brucella spp. recombinant protein U-Omp16 abrogates the IgE-mediated milk allergy

PubMed Central

Smaldini, Paola Lorena; Ibañez, Andrés Esteban; Fossati, Carlos Alberto; Cassataro, Juliana; Docena, Guillermo Horacio

2014-01-01

Food allergies are increasingly common disorders and no therapeutic strategies are yet approved. The unlipidated Omp16 (U-Omp16) is the outer membrane protein of 16 kDa from B. abortus and possesses a mucosal adjuvant property. In this study, we aimed to examine the U-Omp16 capacity to abrogate an allergen-specific Th2 immune response when it is administered as an oral adjuvant in a mouse model of food allergy.   Balb/c mice were sensitized with cholera toxin and cow’s milk proteins (CMP) by gavage and simultaneously treated with U-Omp16 and CMP. Oral challenge with CMP was performed to evaluate the allergic status of mice. Symptoms, local (small bowel cytokine and transcription factor gene expression) and systemic (specific isotypes and spleen cell-secreted cytokines) parameters, and skin tests were done to evaluate the immune response. We found that the oral administration of U-Omp16 with CMP during sensitization dampened the allergic symptoms, with negativization of immediate skin test and increased skin DTH response. Serum specific IgE and IL-5 were inhibited and a Th1 response was promoted (specific IgG2a antibodies and CMP-induced IFN-γ secretion). We found at the mucosal site an inhibition of the gene expression corresponding to IL-13 and Gata-3, with an induction of IFN-γ and T-bet. These results indicated that the oral administration of U-Omp16 significantly controlled the allergic response in sensitized mice with a shift of the balance of Th1- and Th2-T cells toward Th1 predominance. These findings suggest that U-Omp16 may be useful as a Th1-directing adjuvant in an oral vaccine. PMID:25424811

Effects of age on the soccer-specific cognitive-motor performance of elite young soccer players: Comparison between objective measurements and coaches’ evaluation

PubMed Central

Chauvin, Alan; Chassot, Steve; Chenevière, Xavier; Taube, Wolfgang

2017-01-01

The cognitive-motor performance (CMP), defined here as the capacity to rapidly use sensory information and transfer it into efficient motor output, represents a major contributor to performance in almost all sports, including soccer. Here, we used a high-technology system (COGNIFOOT) which combines a visual environment simulator fully synchronized with a motion capture system. This system allowed us to measure objective real-time CMP parameters (passing accuracy/speed and response times) in a large turf-artificial grass playfield. Forty-six (46) young elite soccer players (including 2 female players) aged between 11 and 16 years who belonged to the same youth soccer academy were tested. Each player had to pass the ball as fast and as accurately as possible towards visual targets projected onto a large screen located 5.32 meters in front of him (a short pass situation). We observed a linear age-related increase in the CMP: the passing accuracy, speed and reactiveness of players improved by 4 centimeters, 2.3 km/h and 30 milliseconds per year of age, respectively. These data were converted into 5 point-scales and compared to the judgement of expert coaches, who also used a 5 point-scale to evaluate the same CMP parameters but based on their experience with the players during games and training. The objectively-measured age-related CMP changes were also observed in expert coaches’ judgments although these were more variable across coaches and age categories. This demonstrates that high-technology systems like COGNIFOOT can be used in complement to traditional approaches of talent identification and to objectively monitor the progress of soccer players throughout a cognitive-motor training cycle. PMID:28953958

Effects of age on the soccer-specific cognitive-motor performance of elite young soccer players: Comparison between objective measurements and coaches' evaluation.

PubMed

Hicheur, Halim; Chauvin, Alan; Chassot, Steve; Chenevière, Xavier; Taube, Wolfgang

2017-01-01

The cognitive-motor performance (CMP), defined here as the capacity to rapidly use sensory information and transfer it into efficient motor output, represents a major contributor to performance in almost all sports, including soccer. Here, we used a high-technology system (COGNIFOOT) which combines a visual environment simulator fully synchronized with a motion capture system. This system allowed us to measure objective real-time CMP parameters (passing accuracy/speed and response times) in a large turf-artificial grass playfield. Forty-six (46) young elite soccer players (including 2 female players) aged between 11 and 16 years who belonged to the same youth soccer academy were tested. Each player had to pass the ball as fast and as accurately as possible towards visual targets projected onto a large screen located 5.32 meters in front of him (a short pass situation). We observed a linear age-related increase in the CMP: the passing accuracy, speed and reactiveness of players improved by 4 centimeters, 2.3 km/h and 30 milliseconds per year of age, respectively. These data were converted into 5 point-scales and compared to the judgement of expert coaches, who also used a 5 point-scale to evaluate the same CMP parameters but based on their experience with the players during games and training. The objectively-measured age-related CMP changes were also observed in expert coaches' judgments although these were more variable across coaches and age categories. This demonstrates that high-technology systems like COGNIFOOT can be used in complement to traditional approaches of talent identification and to objectively monitor the progress of soccer players throughout a cognitive-motor training cycle.

The advancement of the high precision stress polishing

NASA Astrophysics Data System (ADS)

Li, Chaoqiang; Lei, Baiping; Han, Yu

2016-10-01

The stress polishing is a kind of large-diameter aspheric machining technology with high efficiency. This paper focuses on the principle, application in the processing of large aspheric mirror, and the domestic and foreign research status of stress polishing, aimed at the problem of insufficient precision of mirror surface deformation calculated by some traditional theories and the problem that the output precision and stability of the support device in stress polishing cannot meet the requirements. The improvement methods from these three aspects are put forward, the characterization method of mirror's elastic deformation in stress polishing, the deformation theory of influence function and the calculation of correction force, the design of actuator's mechanical structure. These improve the precision of stress polishing and provide theoretical basis for the further application of stress polishing in large-diameter aspheric machining.

Gene Expression and Pathway Analysis of Effects of the CMAH Deactivation on Mouse Lung, Kidney and Heart

PubMed Central

Kwon, Deug-Nam; Chang, Byung-Soo; Kim, Jin-Hoi

2014-01-01

Background N-glycolylneuraminic acid (Neu5Gc) is generated by hydroxylation of CMP-Neu5Ac to CMP-Neu5Gc, catalyzed by CMP-Neu5Ac hydroxylase (CMAH). However, humans lack this common mammalian cell surface molecule, Neu5Gc, due to inactivation of the CMAH gene during evolution. CMAH is one of several human-specific genes whose function has been lost by disruption or deletion of the coding frame. It has been suggested that CMAH inactivation has resulted in biochemical or physiological characteristics that have resulted in human-specific diseases. Methodology/Principal Findings To identify differential gene expression profiles associated with the loss of Neu5Gc expression, we performed microarray analysis using Illumina MouseRef-8 v2 Expression BeadChip, using the main tissues (lung, kidney, and heart) from control mice and CMP-Neu5Ac hydroxylase (Cmah) gene knock-out mice, respectively. Out of a total of 25,697 genes, 204, 162, and 147 genes were found to be significantly modulated in the lung, kidney, and heart tissues of the Cmah null mouse, respectively. In this study, we examined the gene expression profiles, using three commercial pathway analysis software packages: Ingenuity Pathways Analysis, Kyoto Encyclopedia of Genes and Genomes analysis, and Pathway Studio. The gene ontology analysis revealed that the top 6 biological processes of these genes included protein metabolism and modification, signal transduction, lipid, fatty acid, and steroid metabolism, nucleoside, nucleotide and nucleic acid metabolism, immunity and defense, and carbohydrate metabolism. Gene interaction network analysis showed a common network that was common to the different tissues of the Cmah null mouse. However, the expression of most sialytransferase mRNAs of Hanganutziu-Deicher antigen, sialy-Tn antigen, Forssman antigen, and Tn antigen was significantly down-regulated in the liver tissue of Cmah null mice. Conclusions/Significance Mice bearing a human-like deletion of the Cmah gene serve as an important model for the study of abnormal pathogenesis and/or metabolism caused by the evolutionary loss of Neu5Gc synthesis in humans. PMID:25229777

Sensing roughness and polish direction

NASA Astrophysics Data System (ADS)

Jakobsen, M. L.; Olesen, A. S.; Larsen, H. E.; Stubager, J.; Hanson, S. G.; Pedersen, T. F.; Pedersen, H. C.

2016-04-01

As a part of the work carried out on a project supported by the Danish council for technology and innovation, we have investigated the option of smoothing standard CNC machined surfaces. In the process of constructing optical prototypes, involving custom-designed optics, the development cost and time consumption can become relatively large numbers in a research budget. Machining the optical surfaces directly is expensive and time consuming. Alternatively, a more standardized and cheaper machining method can be used, but then the object needs to be manually polished. During the polishing process the operator needs information about the RMS-value of the surface roughness and the current direction of the scratches introduces by the polishing process. The RMS-value indicates to the operator how far he is from the final finish, and the scratch orientation is often specified by the customer in order to avoid complications during the casting process. In this work we present a method for measuring the RMS-values of the surface roughness while simultaneously determining the polishing direction. We are mainly interested in the RMS-values in the range from 0 - 100 nm, which corresponds to the finish categories of A1, A2 and A3. Based on simple intensity measurements we estimates the RMS-value of the surface roughness, and by using a sectioned annual photo-detector to collect the scattered light we can determine the direction of polishing and distinguish light scattered from random structures and light scattered from scratches.

Improved Edge Performance in MRF

NASA Technical Reports Server (NTRS)

Shorey, Aric; Jones, Andrew; Durnas, Paul; Tricard, Marc

2004-01-01

The fabrication of large segmented optics requires a polishing process that can correct the figure of a surface to within a short distance from its edges-typically, a few millimeters. The work here is to develop QED's Magnetorheological Finishing (MRF) precision polishing process to minimize residual edge effects.

Neurocognitive Dimensions of Lexical Complexity in Polish

ERIC Educational Resources Information Center

Szlachta, Zanna; Bozic, Mirjana; Jelowicka, Aleksandra; Marslen-Wilson, William D.

2012-01-01

Neuroimaging studies of English suggest that speech comprehension engages two interdependent systems: a bilateral fronto-temporal network responsible for general perceptual and cognitive processing, and a specialised left-lateralised network supporting specifically linguistic processing. Using fMRI we test this hypothesis in Polish, a Slavic…

Effects of the Connected Mathematics Project 2 (CMP2) on the Mathematics Achievement of Grade 6 Students in the Mid-Atlantic Region. Final Report. NCEE 2012-4017

ERIC Educational Resources Information Center

Martin, Taylor; Brasiel, Sarah J.; Turner, Herb; Wise, John C.

2012-01-01

This study examines the effects of Connected Mathematics Project 2 (CMP2) on grade 6 student mathematics achievement and engagement using a cluster randomized controlled trial (RCT) design. It responds to a need to improve mathematics learning in the Mid-Atlantic Region (Delaware, Maryland, New Jersey, Pennsylvania, and Washington, DC). Findings…

Student Attainment in Connected Mathematics Curriculum [and] Effects of the Connected Mathematics Project on Student Achievement. What Works Clearinghouse Detailed Study Report

ERIC Educational Resources Information Center

What Works Clearinghouse, 2004

2004-01-01

In this study, Ridgway et al. found mixed results, depending on the assessment test used. With the Balanced Assessment (BA) test, positive significant differences were found between the Connected Mathematics Project (CMP) students and non-CMP students in grades 6, 7, and 8. The results for the Iowa Test of Basic Skills (ITBS) were less favorable…

Student Attainment in Connected Mathematics Curriculum [and] Effects of the Connected Mathematics Project on Student Achievement. What Works Clearinghouse Brief Study Report

ERIC Educational Resources Information Center

What Works Clearinghouse, 2004

2004-01-01

In this study, Ridgway et al. found mixed results, depending on the assessment test used. With the Balanced Assessment (BA) test, positive significant differences were found between the Connected Mathematics Project (CMP) students and non-CMP students in grades 6, 7, and 8. The results for the Iowa Test of Basic Skills (ITBS) were less favorable…

Free-free and fixed base modal survey tests of the Space Station Common Module Prototype

NASA Technical Reports Server (NTRS)

Driskill, T. C.; Anderson, J. B.; Coleman, A. D.

1992-01-01

This paper describes the testing aspects and the problems encountered during the free-free and fixed base modal surveys completed on the original Space Station Common Module Prototype (CMP). The CMP is a 40-ft long by 14.5-ft diameter 'waffle-grid' cylinder built by the Boeing Company and housed at the Marshall Space Flight Center (MSFC) near Huntsville, AL. The CMP modal survey tests were conducted at MSFC by the Dynamics Test Branch. The free-free modal survey tests (June '90 to Sept. '90) included interface verification tests (IFVT), often referred to as impedance measurements, mass-additive testing and linearity studies. The fixed base modal survey tests (Feb. '91 to April '91), including linearity studies, were conducted in a fixture designed to constrain the CMP in 7 total degrees-of-freedom at five trunnion interfaces (two primary, two secondary, and the keel). The fixture also incorporated an airbag off-load system designed to alleviate the non-linear effects of friction in the primary and secondary trunnion interfaces. Numerous test configurations were performed with the objective of providing a modal data base for evaluating the various testing methodologies to verify dynamic finite element models used for input to coupled load analysis.

Intellectual disability and bleeding diathesis due to deficient CMP--sialic acid transport.

PubMed

Mohamed, Miski; Ashikov, Angel; Guillard, Mailys; Robben, Joris H; Schmidt, Samuel; van den Heuvel, B; de Brouwer, Arjan P M; Gerardy-Schahn, Rita; Deen, Peter M T; Wevers, Ron A; Lefeber, Dirk J; Morava, Eva

2013-08-13

To identify the underlying genetic defect in a patient with intellectual disability, seizures, ataxia, macrothrombocytopenia, renal and cardiac involvement, and abnormal protein glycosylation. Genetic studies involved homozygosity mapping by 250K single nucleotide polymorphism array and SLC35A1 sequencing. Functional studies included biochemical assays for N-glycosylation and mucin-type O-glycosylation and SLC35A1-encoded cytidine 5'-monophosphosialic acid (CMP-sialic acid) transport after heterologous expression in yeast. We performed biochemical analysis and found combined N- and O-glycosylation abnormalities and specific reduction in sialylation in this patient. Homozygosity mapping revealed homozygosity for the CMP-sialic acid transporter SLC35A1. Mutation analysis identified a homozygous c.303G > C (p.Gln101His) missense mutation that was heterozygous in both parents. Functional analysis of mutant SLC35A1 showed normal Golgi localization but 50% reduction in transport activity of CMP-sialic acid in vitro. We confirm an autosomal recessive, generalized sialylation defect due to mutations in SLC35A1. The primary neurologic presentation consisting of ataxia, intellectual disability, and seizures, in combination with bleeding diathesis and proteinuria, is discriminative from a previous case described with deficient sialic acid transporter. Our study underlines the importance of sialylation for normal CNS development and regular organ function.

Development and application of a crossbreeding simulation model for goat production systems in tropical regions.

PubMed

Tsukahara, Y; Oishi, K; Hirooka, H

2011-12-01

A deterministic simulation model was developed to estimate biological production efficiency and to evaluate goat crossbreeding systems under tropical conditions. The model involves 5 production systems: pure indigenous, first filial generations (F1), backcross (BC), composite breeds of F1 (CMP(F1)), and BC (CMP(BC)). The model first simulates growth, reproduction, lactation, and energy intakes of a doe and a kid on a 1-d time step at the individual level and thereafter the outputs are integrated into the herd dynamics program. The ability of the model to simulate individual performances was tested under a base situation. The simulation results represented daily BW changes, ME requirements, and milk yield and the estimates were within the range of published data. Two conventional goat production scenarios (an intensive milk production scenario and an integrated goat and oil palm production scenario) in Malaysia were examined. The simulation results of the intensive milk production scenario showed the greater production efficiency of the CMP(BC) and CMP(F1) systems and decreased production efficiency of the F1 and BC systems. The results of the integrated goat and oil palm production scenario showed that the production efficiency and stocking rate were greater for the indigenous goats than for the crossbreeding systems.

Efficient computer algorithms for infrared astronomy data processing

NASA Technical Reports Server (NTRS)

Pelzmann, R. F., Jr.

1976-01-01

Data processing techniques to be studied for use in infrared astronomy data analysis systems are outlined. Only data from space based telescope systems operating as survey instruments are considered. Resulting algorithms, and in some cases specific software, will be applicable for use with the infrared astronomy satellite (IRAS) and the shuttle infrared telescope facility (SIRTF). Operational tests made during the investigation use data from the celestial mapping program (CMP). The overall task differs from that involved in ground-based infrared telescope data reduction.

The Young Rural Generation in the Polish People's Republic: Autobiographies, Personalities, Things and Events, Biography and History.

ERIC Educational Resources Information Center

Chalasinski, Jozef

Diaries of rural youth writing during the transformation period of the Polish Peoples Republic (1950-1960's) were analyzed in terms of: individual autonomization and historical processes; identification with the Polish Peoples Republic and self-awareness (direct experience and historical awareness); youth and the revolutionary spirit of…

Electrochemical Polishing Applications and EIS of a Novel Choline Chloride-Based Ionic Liquid

DOE Office of Scientific and Technical Information (OSTI.GOV)

Wixtrom, Alex I.; Buhler, Jessica E.; Reece, Charles E.

2013-06-01

Minimal surface roughness is a critical feature for high-field superconducting radio frequency (SRF) cavities used to engineer particle accelerators. Current methods for polishing Niobium cavities typically utilize solutions containing a mixture of concentrated sulfuric and hydrofluoric acid. Polishing processes such as these are effective, yet there are many hazards and costs associated with the use (and safe disposal) of the concentrated acid solutions. An alternative method for electrochemical polishing of the cavities was explored using a novel ionic liquid solution containing choline chloride. Potentiostatic electrochemical impedance spectroscopy (EIS) was used to analyze the ionic polishing solution. Final surface roughness ofmore » the Nb was found to be comparable to that of the acid-polishing method, as assessed by atomic force microscopy (AFM). This indicates that ionic liquid-based electrochemical polishing of Nb is a viable replacement for acid-based methods for preparation of SRF cavities.« less

Analysis of the convergence rules of full-range PSD surface error of magnetorheological figuring KDP crystal.

PubMed

Chen, Shaoshan; He, Deyu; Wu, Yi; Chen, Huangfei; Zhang, Zaijing; Chen, Yunlei

2016-10-01

A new non-aqueous and abrasive-free magnetorheological finishing (MRF) method is adopted for processing potassium dihydrogen phosphate (KDP) crystal due to its low hardness, high brittleness, temperature sensitivity, and water solubility. This paper researches the convergence rules of the surface error of an initial single-point diamond turning (SPDT)-finished KDP crystal after MRF polishing. Currently, the SPDT process contains spiral cutting and fly cutting. The main difference of these two processes lies in the morphology of intermediate-frequency turning marks on the surface, which affects the convergence rules. The turning marks after spiral cutting are a series of concentric circles, while the turning marks after fly cutting are a series of parallel big arcs. Polishing results indicate that MRF polishing can only improve the low-frequency errors (L>10  mm) of a spiral-cutting KDP crystal. MRF polishing can improve the full-range surface errors (L>0.01  mm) of a fly-cutting KDP crystal if the polishing process is not done more than two times for single surface. We can conclude a fly-cutting KDP crystal will meet better optical performance after MRF figuring than a spiral-cutting KDP crystal with similar initial surface performance.

Wafer edge overlay control solution for N7 and beyond

NASA Astrophysics Data System (ADS)

van Haren, Richard; Calado, Victor; van Dijk, Leon; Hermans, Jan; Kumar, Kaushik; Yamashita, Fumiko

2018-03-01

Historically, the on-product overlay performance close to the wafer edge is lagging with respect to the inner part of the wafer. The reason for this is that wafer processing is less controlled close to the wafer edge as opposed to the rest of the wafer. It is generally accepted that Chemical Vapor Deposition (CVD) of stressed layers that cause wafer warp, wafer table contamination, Chemical Mechanical Polishing (CMP), and Reactive Ion Etch (RIE) may deteriorate the overlay performance and/or registration close to the wafer edge. For the N7 technology node and beyond, it is anticipated that the tight on-product overlay specification is required across the full wafer which includes the edge region. In this work, we highlight one contributor that may negatively impact the on-product overlay performance, namely the etch step. The focus will be mainly on the wafer edge region but the remaining part of the wafer is considered as well. Three use-cases are examined: multiple Litho-Etch steps (LEn), contact hole layer etch, and the copper dual damascene etch. We characterize the etch contribution by considering the overlay measurement after resist development inspect (ADI) and after etch inspect (AEI). We show that the Yieldstar diffraction based overlay (μDBO) measurements can be utilized to characterize the etch contribution to the overlay budget. The effects of target asymmetry as well as overlay shifts are considered and compared with SEM measurements. Based on the results above, we propose a control solution aiming to reduce or even eliminate the delta between ADI and AEI. By doing so, target/mark to device offsets due to etch might be avoided.

Removal of single point diamond-turning marks by abrasive jet polishing.

PubMed

Li, Z Z; Wang, J M; Peng, X Q; Ho, L T; Yin, Z Q; Li, S Y; Cheung, C F

2011-06-01

Single point diamond turning (SPDT) is highly controllable and versatile in producing axially symmetric forms, non-axially-symmetric forms, microstructured surfaces, and free forms. However, the fine SPDT marks left in the surface limit its performance, and they are difficult to reduce or eliminate. It is unpractical for traditional methods to remove the fine marks without destroying their forms, especially for the aspheres and free forms. This paper introduces abrasive jet polishing (AJP) for the posttreatment of diamond-turned surfaces to remove the periodic microstructures. Samples of diamond-turned electroless nickel plated plano mirror were used in the experiments. One sample with an original surface roughness of more than 400 nm decreased to 4 nm after two iterations abrasive jet polishing; the surface roughness of another sample went from 3.7 nm to 1.4 nm after polishing. The periodic signatures on both of the samples were removed entirely after polishing. Contrastive experimental research was carried out on electroless nickel mirror with magnetorheological finishing, computer controlled optical surfacing, and AJP. The experimental results indicate that AJP is more appropriate in removing the periodic SPDT marks. Also, a figure maintaining experiment was carried out with the AJP process; the uniform polishing process shows that the AJP process can remove the periodic turning marks without destroying the original form.

Reciprocal Interactions between Multiple Myeloma Cells and Osteoprogenitor Cells Affect Bone Formation and Tumor Growth

DTIC Science & Technology

2015-12-01

cells (HSCs) are multipotent cells that differentiate into myeloid, lymphoid and erythroid lineages, and have short-term or long-term regenerative...All rights reserved Nature Reviews | Rheumatology a b MPP CMP CLP Lymphoid cells NK cellB cell T cell Megakaryocyte and erythrocytes Macrophage and...into other cell types. CLP, common lymphoid progenitor; CMP, common myeloid progenitor; MPP, multipotent progenitor; NK cell , natural killer cell . R E

[The optimization of chondromalacia patellae diagnosis by NMR tomography. The use of an apparatus for cartilage compression].

PubMed

König, H; Dinkelaker, F; Wolf, K J

1991-08-01

The aim of this study was to improve the MRI diagnosis of CMP, with special reference to the early stages and accurate staging. For this purpose, the retropatellar cartilage was examined by MRI while compression was carried out, using 21 patients and five normal controls. The compression was applied by means of a specially constructed device. Changes in cartilage thickness and signal intensity were evaluated quantitatively during FLASH and FISP sequences. In all patients the results of arthroscopies were available and in 12 patients, cartilage biopsies had been obtained. CMP stage I could be distinguished from normal cartilage by reduction in cartilage thickness and signal increase from the oedematous cartilage during compression. In CMP stages II/III, abnormal protein deposition of collagen type I could be demonstrated by its compressibility. In stages III and IV, the method does not add any significant additional information.

Characterization of high-resistivity CdTe and Cd0.9Zn0.1Te crystals grown by Bridgman method for radiation detector applications

NASA Astrophysics Data System (ADS)

Mandal, Krishna C.; Krishna, Ramesh M.; Pak, Rahmi O.; Mannan, Mohammad A.

2014-09-01

CdTe and Cd0.9Zn0.1Te (CZT) crystals have been studied extensively for various applications including x- and γ-ray imaging and high energy radiation detectors. The crystals were grown from zone refined ultra-pure precursor materials using a vertical Bridgman furnace. The growth process has been monitored, controlled, and optimized by a computer simulation and modeling program developed in our laboratory. The grown crystals were thoroughly characterized after cutting wafers from the ingots and processed by chemo-mechanical polishing (CMP). The infrared (IR) transmission images of the post-treated CdTe and CZT crystals showed average Te inclusion size of ~10 μm for CdTe and ~8 μm for CZT crystal. The etch pit density was ≤ 5×104 cm-2 for CdTe and ≤ 3×104 cm-2 for CZT. Various planar and Frisch collar detectors were fabricated and evaluated. From the current-voltage measurements, the electrical resistivity was estimated to be ~ 1.5×1010 Ω-cm for CdTe and 2-5×1011 Ω-cm for CZT. The Hecht analysis of electron and hole mobility-lifetime products (μτe and μτh) showed μτe = 2×10-3 cm2/V (μτh = 8×10-5 cm2/V) and 3-6×10-3 cm2/V (μτh = 4- 6×10-5 cm2/V) for CdTe and CZT, respectively. Detectors in single pixel, Frisch collar, and coplanar grid geometries were fabricated. Detectors in Frisch grid and guard-ring configuration were found to exhibit energy resolution of 1.4% and 2.6 %, respectively, for 662 keV gamma rays. Assessments of the detector performance have been carried out also using 241Am (60 keV) showing energy resolution of 4.2% FWHM.

Removal Rate Model for Magnetorheological Finishing of Glass

DOE Office of Scientific and Technical Information (OSTI.GOV)

DeGroote, J.E.; Marino, A.E.; WIlson, J.P.

2007-11-14

Magnetorheological finishing (MRF) is a deterministic subaperture polishing process. The process uses a magntorheological (MR) fluid that consists of micrometer-sized, spherical, magnetic carbonyl iron (CI) particles, nonmagnetic polishing abrasives, water, and stabilizers. Material removal occurs when the CI and nonmagnetic polishing abrasives shear material off the surface being polished. We introduce a new MRF material removal rate model for glass. This model contains terms for the near surface mechanical properties of glass, drag force, polishing abrasive size and concentration, chemical durability of the glass, MR fluid pH, and the glass composition. We introduce quantitative chemical predictors for the first time,more » to the best of our knowledge, into an MRF removal rate model. We validate individual terms in our model separately and then combine all of the terms to show the whole MRF material removal model compared with experimental data. All of our experimental data were obtained using nanodiamond MR fluids and a set of six optical glasses.« less

Influence law of structural characteristics on the surface roughness of a magnetorheological-finished KDP crystal.

PubMed

Chen, Shaoshan; Li, Shengyi; Hu, Hao; Li, Qi; Tie, Guipeng

2014-11-01

A new nonaqueous and abrasive-free magnetorheological finishing (MRF) method is adopted for processing potassium dihydrogen phosphate (KDP) crystal due to its low hardness, high brittleness, temperature sensitivity, and water solubility. This paper researches the influence of structural characteristics on the surface roughness of MRF-finished KDP crystal. The material removal by dissolution is uniform layer by layer when the polishing parameters are stable. The angle between the direction of the polishing wheel's linear velocity and the initial turning lines will affect the surface roughness. If the direction is perpendicular to the initial turning lines, the polishing can remove the lines. If the direction is parallel to the initial turning lines, the polishing can achieve better surface roughness. The structural characteristic of KDP crystal is related to its internal chemical bonds due to its anisotropy. During the MRF finishing process, surface roughness will be improved if the structural characteristics of the KDP crystal are the same on both sides of the wheel. The processing results of (001) plane crystal show we can get the best surface roughness (RMS of 0.809 nm) if the directions of cutting and MRF polishing are along the (110) direction.

Grazing Incidence Optics Technology

NASA Technical Reports Server (NTRS)

Ramsey, Brian; Smith, W. Scott; Gubarev, Mikhail; McCracken, Jeff

2015-01-01

This project is to demonstrate the capability to directly fabricate lightweight, high-resolution, grazing-incidence x-ray optics using a commercially available robotic polishing machine. Typical x-ray optics production at NASA Marshall Space Flight Center (MSFC) uses a replication process in which metal mirrors are electroformed on to figured and polished mandrels from which they are later removed. The attraction of this process is that multiple copies can be made from a single master. The drawback is that the replication process limits the angular resolution that can be attained. By directly fabricating each shell, errors inherent in the replication process are removed. The principal challenge now becomes how to support the mirror shell during all aspects of fabrication, including the necessary metrology to converge on the required mirror performance specifications. This program makes use of a Zeeko seven-axis computer-controlled polishing machine (see fig. 1) and supporting fabrication, metrology, and test equipment at MSFC. The overall development plan calls for proof-of-concept demonstration with relatively thick mirror shells (5-6 mm, fig. 2) which are straightforward to support and then a transition to much thinner shells (2-3 mm), which are an order of magnitude thinner than those used for Chandra. Both glass and metal substrates are being investigated. Currently, a thick glass shell is being figured. This has enabled experience to be gained with programming and operating the polishing machine without worrying about shell distortions or breakage. It has also allowed time for more complex support mechanisms for figuring/ polishing and metrology to be designed for the more challenging thinner shells. These are now in fabrication. Figure 1: Zeeko polishing machine.

Microbial biofilms for the removal of Cu²⁺ from CMP wastewater.

PubMed

Mosier, Aaron P; Behnke, Jason; Jin, Eileen T; Cady, Nathaniel C

2015-09-01

The modern semiconductor industry relies heavily on a process known as chemical mechanical planarization, which uses physical and chemical processes to remove excess material from the surface of silicon wafers during microchip fabrication. This process results in large volumes of wastewater containing dissolved metals including copper (Cu(2+)), which must then be filtered and treated before release into municipal waste systems. We have investigated the potential use of bacterial and fungal biomass as an alternative to the currently used ion-exchange resins for the adsorption of dissolved Cu(2+) from high-throughput industrial waste streams. A library of candidate microorganisms, including Lactobacillus casei and Pichia pastoris, was screened for ability to bind Cu(2+) from solution and to form static biofilm communities within packed-bed adsorption columns. The binding efficiency of these biomass-based adsorption columns was assessed under various flow conditions and compared to that of industrially used ion-exchange resins. We demonstrated the potential to regenerate the biomass within the adsorption columns through the use of a hydrochloric acid wash, and subsequently reuse the columns for additional copper binding. While the binding efficiency and capacity of the developed L. casei/P. pastoris biomass filters was inferior to ion-exchange resin, the potential for repeated reuse of these filters, coupled with the advantages of a more sustainable "green" adsorption process, make this technique an attractive candidate for use in industrial-scale CMP wastewater treatment. Copyright © 2015 Elsevier Ltd. All rights reserved.

Approach for axisymmetrical asphere polishing with full-area tools

NASA Astrophysics Data System (ADS)

Novi, Andrea; Melozzi, Mauro

1999-09-01

Aspherics up to 500 nm diameter in optical glass or in ceramic substrates have been fabricated using area- compensated polishing tools and conventional optical shop machines. The tool forms are derived starting from the actual shape of the part under figuring. The figure error is measured using an interferometer mounted on-line with the polishing machine. Measurements are taken after each polishing step to compute the new tool form. The process speeds up the fabrication of aspheres and it improves repeatability in the manufacturing of axisymmetrical optics using moderate cost equipment's up to astronomical requirements. In the paper we present some examples of polishing results using the above mentioned approach on different aspherics for space applications.

Influence of chemical and mechanical polishing on water sorption and solubility of denture base acrylic resins.

PubMed

Rahal, Juliana Saab; Mesquita, Marcelo Ferraz; Henriques, Guilherme Elias Pessanha; Nóbilo, Mauro Antonio Arruda

2004-01-01

Influence of polishing methods on water sorption and solubility of denture base acrylic resins was studied. Eighty samples were divided into groups: Classico (CL), and QC 20 (QC) - hot water bath cured; Acron MC (AC), and Onda Cryl (ON) - microwave cured; and submitted to mechanical polishing (MP) - pumice slurry, chalk powder, soft brush and felt cone in a bench vise; or chemical polishing (CP) - heated monomer fluid in a chemical polisher. The first desiccation process was followed by storage in distilled water at 37 +/- 1 degrees C for 1 h, 1 day, 1, 2, 3 and 4 weeks. Concluding each period, water sorption was measured. After the fourth week, a second desiccation process was done to calculate solubility. Data were submitted to analysis of variance, followed by Tukey test (p

Magnetorheological elastic super-smooth finishing for high-efficiency manufacturing of ultraviolet laser resistant optics

NASA Astrophysics Data System (ADS)

Shi, Feng; Shu, Yong; Dai, Yifan; Peng, Xiaoqiang; Li, Shengyi

2013-07-01

Based on the elastic-plastic deformation theory, status between abrasives and workpiece in magnetorheological finishing (MRF) process and the feasibility of elastic polishing are analyzed. The relationship among material removal mechanism and particle force, removal efficiency, and surface topography are revealed through a set of experiments. The chemical dominant elastic super-smooth polishing can be fulfilled by changing the components of magnetorheological (MR) fluid and optimizing polishing parameters. The MR elastic super-smooth finishing technology can be applied in polishing high-power laser-irradiated components with high efficiency, high accuracy, low damage, and high laser-induced damage threshold (LIDT). A 430×430×10 mm fused silica (FS) optic window is polished and surface error is improved from 538.241 nm [peak to valley (PV)], 96.376 nm (rms) to 76.372 nm (PV), 8.295 nm (rms) after 51.6 h rough polishing, 42.6 h fine polishing, and 54.6 h super-smooth polishing. A 50×50×10 mm sample is polished with exactly the same parameters. The roughness is improved from 1.793 nm [roughness average (Ra)] to 0.167 nm (Ra) and LIDT is improved from 9.77 to 19.2 J/cm2 after MRF elastic polishing.

Strain-free polished channel-cut crystal monochromators: a new approach and results

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kasman, Elina; Montgomery, Jonathan; Huang, XianRong

The use of channel-cut crystal monochromators has been traditionally limited to applications that can tolerate the rough surface quality from wet etching without polishing. We have previously presented and discussed the motivation for producing channel cut crystals with strain-free polished surfaces [1]. Afterwards, we have undertaken an effort to design and implement an automated machine for polishing channel-cut crystals. The initial effort led to inefficient results. Since then, we conceptualized, designed, and implemented a new version of the channel-cut polishing machine, now called C-CHiRP (Channel-Cut High Resolution Polisher), also known as CCPM V2.0. The new machine design no longer utilizesmore » Figure-8 motion that mimics manual polishing. Instead, the polishing is achieved by a combination of rotary and linear functions of two coordinated motion systems. Here we present the new design of C-CHiRP, its capabilities and features. Multiple channel-cut crystals polished using the C-CHiRP have been deployed into several beamlines at the Advanced Photon Source (APS). We present the measurements of surface finish, flatness, as well as topography results obtained at 1-BM of APS, as compared with results typically achieved when polishing flat-surface monochromator crystals using conventional polishing processes. Limitations of the current machine design, capabilities and considerations for strain-free polishing of highly complex crystals are also discussed, together with an outlook for future developments and improvements.« less

STS-112 final main engine is installed after welding/polishing process

NASA Technical Reports Server (NTRS)

2002-01-01

KENNEDY SPACE CENTER, FLA. -- The last engine is installed in orbiter Atlantis after a welding and polishing process was undertaken on flow liners where cracks were detected. All engines were removed for inspection of flow liners. Atlantis will next fly on mission STS-112, scheduled for launch no earlier than Oct. 2.

Highly efficient temperature-dependent chiral separation with a nucleotide-based coordination polymer.

PubMed

Bruno, Rosaria; Marino, Nadia; Bartella, Lucia; Di Donna, Leonardo; De Munno, Giovanni; Pardo, Emilio; Armentano, Donatella

2018-06-05

We report a new chiral coordination polymer, prepared from the cytidine 5'-monophosphate (CMP) nucleotide, capable of separating efficiently (enantiomeric excess of ca. 100%) racemic mixtures of l- and d-Asp in a temperature-dependent manner. The crystal structure of the host-guest adsorbate, with the d-Asp guest molecules loaded within its channels, could be solved allowing a direct visualization of the chiral recognition process.

Optimization technique for rolled edge control process based on the acentric tool influence functions.

PubMed

Du, Hang; Song, Ci; Li, Shengyi; Xu, Mingjin; Peng, Xiaoqiang

2017-05-20

In the process of computer controlled optical surfacing (CCOS), the uncontrollable rolled edge restricts further improvements of the machining accuracy and efficiency. Two reasons are responsible for the rolled edge problem during small tool polishing. One is that the edge areas cannot be processed because of the orbit movement. The other is that changing the tool influence function (TIF) is difficult to compensate for in algorithms, since pressure step appears in the local pressure distribution at the surface edge. In this paper, an acentric tool influence function (A-TIF) is designed to remove the rolled edge after CCOS polishing. The model of A-TIF is analyzed theoretically, and a control point translation dwell time algorithm is used to verify that the full aperture of the workpiece can be covered by the peak removal point of the tool influence functions. Thus, surface residual error in the full aperture can be effectively corrected. Finally, the experiments are carried out. Two fused silica glass samples of 100  mm×100  mm are polished by traditional CCOS and the A-TIF method, respectively. The rolled edge was clearly produced in the sample polished by the traditional CCOS, while residual errors do not show this problem the sample polished by the A-TIF method. Therefore, the rolled edge caused by the traditional CCOS process is successfully suppressed during the A-TIF process. The ability to suppress the rolled edge of the designed A-TIF has been confirmed.

Figure and caption for LDRD annual report

DOE Office of Scientific and Technical Information (OSTI.GOV)

Suratwala, T.

2017-10-16

Material removal rate of various optical material workpieces polished using various colloidal slurries as a function of partial charge difference. Partial charge difference is a parameter calculated from a new chemical model proposed to link the condensation reaction rate with polishing material removal rate. This chemical model can serve as a global platform to predict & design polishing processes for a wide variety of workpiece materials and slurry compositions.

The improvement of laser induced damage resistance of optical workpiece surface by hydrodynamic effect polishing

NASA Astrophysics Data System (ADS)

Peng, Wenqiang; Guan, Chaoliang; Li, Shengyi; Wang, Zhuo

2016-10-01

Surface and subsurface damage in optical element will greatly decrease the laser induced damage threshold (LIDT) in the intense laser optical system. Processing damage on the workpiece surface can be inevitably caused when the material is removed in brittle or plastic mode. As a non-contact polishing technology, hydrodynamic effect polishing (HEP) shows very good performance on generating an ultra-smooth surface without damage. The material is removed by chemisorption between nanoparticle and workpiece surface in the elastic mode in HEP. The subsurface damage and surface scratches can be effectively removed after the polishing process. Meanwhile ultra-smooth surface with atomic level surface roughness can be achieved. To investigate the improvement of LIDT of optical workpiece, polishing experiment was conducted on a magnetorheological finishing (MRF) silica glass sample. AFM measurement results show that all the MRF directional plastic marks have been removed clearly and the root-mean-square (rms) surface roughness has decreased from 0.673nm to 0.177nm after HEP process. Laser induced damage experiment was conducted with laser pulse of 1064nm wavelength and 10ns time width. Compared with the original state, the LEDT of the silica glass sample polished by HEP has increased from 29.78J/cm2 to 45.47J/cm2. It demonstrates that LIDT of optical element treated by HEP can be greatly improved for ultra low surface roughness and nearly defect-free surface/subsurface.

NeuA sialic acid O-acetylesterase activity modulates O-acetylation of capsular polysaccharide in group B Streptococcus.

PubMed

Lewis, Amanda L; Cao, Hongzhi; Patel, Silpa K; Diaz, Sandra; Ryan, Wesley; Carlin, Aaron F; Thon, Vireak; Lewis, Warren G; Varki, Ajit; Chen, Xi; Nizet, Victor

2007-09-21

Group B Streptococcus (GBS) is a common cause of neonatal sepsis and meningitis. A major GBS virulence determinant is its sialic acid (Sia)-capped capsular polysaccharide. Recently, we discovered the presence and genetic basis of capsular Sia O-acetylation in GBS. We now characterize a GBS Sia O-acetylesterase that modulates the degree of GBS surface O-acetylation. The GBS Sia O-acetylesterase operates cooperatively with the GBS CMP-Sia synthetase, both part of a single polypeptide encoded by the neuA gene. NeuA de-O-acetylation of free 9-O-acetyl-N-acetylneuraminic acid (Neu5,9Ac(2)) was enhanced by CTP and Mg(2+), the substrate and co-factor, respectively, of the N-terminal GBS CMP-Sia synthetase domain. In contrast, the homologous bifunctional NeuA esterase from Escherichia coli K1 did not display cofactor dependence. Further analyses showed that in vitro, GBS NeuA can operate via two alternate enzymatic pathways: de-O-acetylation of Neu5,9Ac(2) followed by CMP activation of Neu5Ac or activation of Neu5,9Ac(2) followed by de-O-acetylation of CMP-Neu5,9Ac(2). Consistent with in vitro esterase assays, genetic deletion of GBS neuA led to accumulation of intracellular O-acetylated Sias, and overexpression of GBS NeuA reduced O-acetylation of Sias on the bacterial surface. Site-directed mutagenesis of conserved asparagine residue 301 abolished esterase activity but preserved CMP-Sia synthetase activity, as evidenced by hyper-O-acetylation of capsular polysaccharide Sias on GBS expressing only the N301A NeuA allele. These studies demonstrate a novel mechanism regulating the extent of capsular Sia O-acetylation in intact bacteria and provide a genetic strategy for manipulating GBS O-acetylation in order to explore the role of this modification in GBS pathogenesis and immunogenicity.

Substrate-induced fit of the ATP binding site of cytidine monophosphate kinase from Escherichia coli: time-resolved fluorescence of 3'-anthraniloyl-2'-deoxy-ADP and molecular modeling.

PubMed

Li de La Sierra, I M; Gallay, J; Vincent, M; Bertrand, T; Briozzo, P; Bârzu, O; Gilles, A M

2000-12-26

The conformation and dynamics of the ATP binding site of cytidine monophosphate kinase from Escherichia coli (CMPK(coli)), which catalyzes specifically the phosphate exchange between ATP and CMP, was studied using the fluorescence properties of 3'-anthraniloyl-2'-deoxy-ADP, a specific ligand of the enzyme. The spectroscopic properties of the bound fluorescent nucleotide change strongly with respect to those in aqueous solution. These changes (red shift of the absorption and excitation spectra, large increase of the excited state lifetime) are compared to those observed in different solvents. These data, as well as acrylamide quenching experiments, suggest that the anthraniloyl moiety is protected from the aqueous solvent upon binding to the ATP binding site, irrespective of the presence of CMP or CDP. The protein-bound ADP analogue exhibits a restricted fast subnanosecond rotational motion, completely blocked by CMP binding. The energy-minimized models of CMPK(coli) complexed with 3'-anthraniloyl-2'-deoxy-ADP using the crystal structures of the ligand-free protein and of its complex with CDP (PDB codes and, respectively) were compared to the crystal structure of UMP/CMP kinase from Dictyostelium discoideum complexed with substrates (PDB code ). The key residues for ATP/ADP binding to CMPK(coli) were identified as R157 and I209, their side chains sandwiching the adenine ring. Moreover, the residues involved in the fixation of the phosphate groups are conserved in both proteins. In the model, the accessibility of the fluorescent ring to the solvent should be substantial if the LID conformation remained unchanged, by contrast to the fluorescence data. These results provide the first experimental arguments about an ATP-mediated induced-fit of the LID in CMPK(coli) modulated by CMP, leading to a closed conformation of the active site, protected from water.

High quality optically polished aluminum mirror and process for producing

NASA Technical Reports Server (NTRS)

Lyons, III, James J. (Inventor); Zaniewski, John J. (Inventor)

2005-01-01

A new technical advancement in the field of precision aluminum optics permits high quality optical polishing of aluminum monolith, which, in the field of optics, offers numerous benefits because of its machinability, lightweight, and low cost. This invention combines diamond turning and conventional polishing along with india ink, a newly adopted material, for the polishing to accomplish a significant improvement in surface precision of aluminum monolith for optical purposes. This invention guarantees the precise optical polishing of typical bare aluminum monolith to surface roughness of less than about 30 angstroms rms and preferably about 5 angstroms rms while maintaining a surface figure accuracy in terms of surface figure error of not more than one-fifteenth of wave peak-to-valley.

High quality optically polished aluminum mirror and process for producing

NASA Technical Reports Server (NTRS)

Lyons, III, James J. (Inventor); Zaniewski, John J. (Inventor)

2002-01-01

A new technical advancement in the field of precision aluminum optics permits high quality optical polishing of aluminum monolith, which, in the field of optics, offers numerous benefits because of its machinability, lightweight, and low cost. This invention combines diamond turning and conventional polishing along with india ink, a newly adopted material, for the polishing to accomplish a significant improvement in surface precision of aluminum monolith for optical purposes. This invention guarantees the precise optical polishing of typical bare aluminum monolith to surface roughness of less than about 30 angstroms rms and preferably about 5 angstroms rms while maintaining a surface figure accuracy in terms of surface figure error of not more than one-fifteenth of wave peak-to-valley.

Doing that thing that scientists do: A discovery-driven module on protein purification and characterization for the undergraduate biochemistry laboratory classroom.

PubMed

Garrett, Teresa A; Osmundson, Joseph; Isaacson, Marisa; Herrera, Jennifer

2015-01-01

In traditional introductory biochemistry laboratory classes students learn techniques for protein purification and analysis by following provided, established, step-by-step procedures. Students are exposed to a variety of biochemical techniques but are often not developing procedures or collecting new, original data. In this laboratory module, students develop research skills through work on an original research project and gain confidence in their ability to design and execute an experiment while faculty can enhance their scholarly pursuits through the acquisition of original data in the classroom laboratory. Students are prepared for a 6-8 week discovery-driven project on the purification of the Escherichia coli cytidylate kinase (CMP kinase) through in class problems and other laboratory exercises on bioinformatics and protein structure analysis. After a minimal amount of guidance on how to perform the CMP kinase in vitro enzyme assay, SDS-PAGE, and the basics of protein purification, students, working in groups of three to four, develop a protein purification protocol based on the scientific literature and investigate some aspect of CMP kinase that interests them. Through this process, students learn how to implement a new but perhaps previously worked out procedure to answer their research question. In addition, they learn the importance of keeping a clear and thorough laboratory notebook and how to interpret their data and use that data to inform the next set of experiments. Following this module, students had increased confidence in their ability to do basic biochemistry techniques and reported that the "self-directed" nature of this lab increased their engagement in the project. © 2015 The International Union of Biochemistry and Molecular Biology.

Proteomics: a tool to develop novel diagnostic methods and unravel molecular mechanisms of pediatric diseases.

PubMed

Torres-Arroyo, Angélica; Ruiz-Lara, Arturo; Castillo-Villanueva, Adriana; Méndez-Cruz, Sara Teresa; Espinosa-Padilla, Sara Elvia; Espinosa-Rosales, Francisco Javier; Zarate-Mondragón, Flora; Cervantes-Bustamante, Roberto; Bosch-Canto, Vanessa; Vizzuett-López, Iris; Ordaz-Fávila, Juan Carlos; Oria-Hernández, Jesús; Reyes-Vivas, Horacio

Proteomics is the study of the expression of changes and post-translational modifications (PTM) of proteins along a metabolic condition either normal or pathological. In the field of health, proteomics allows obtaining valuable data for treatment, diagnosis or pathophysiological mechanisms of different illnesses. To illustrate the aforementioned, we describe two projects currently being performed at the Instituto Nacional de Pediatría: The immuno-proteomic study of cow milk allergy and the Proteomic study of childhood cataract. Cow's milk proteins (CMP) are the first antigens to which infants are exposed and generate allergy in some of them. In Mexico, the incidence of CMP allergy has been estimated at 5-7%. Clinical manifestations include both gastrointestinal and extra-gastrointestinal symptoms, making its diagnosis extremely difficult. An inappropriate diagnosis affects the development and growth of children. The goals of the study are to identify the main immune-reactive CMP in Mexican pediatric population and to design more accurate diagnostic tools for this disease. Childhood cataract is a major ocular disease representing one of the main causes of blindness in infants; in developing countries, this disease promotes up to 27% of cases related to visual loss. From this group, it has been estimated that close to 60% of children do not survive beyond two years after vision lost. PTM have been pointed out as the main cause of protein precipitation at the crystalline and, consequently, clouding of this tissue. The study of childhood cataract represents an outstanding opportunity to identify the PTM associated to the cataract-genesis process. Copyright © 2017 Hospital Infantil de México Federico Gómez. Publicado por Masson Doyma México S.A. All rights reserved.

A Conway-Maxwell-Poisson (CMP) model to address data dispersion on positron emission tomography.

PubMed

Santarelli, Maria Filomena; Della Latta, Daniele; Scipioni, Michele; Positano, Vincenzo; Landini, Luigi

2016-10-01

Positron emission tomography (PET) in medicine exploits the properties of positron-emitting unstable nuclei. The pairs of γ- rays emitted after annihilation are revealed by coincidence detectors and stored as projections in a sinogram. It is well known that radioactive decay follows a Poisson distribution; however, deviation from Poisson statistics occurs on PET projection data prior to reconstruction due to physical effects, measurement errors, correction of deadtime, scatter, and random coincidences. A model that describes the statistical behavior of measured and corrected PET data can aid in understanding the statistical nature of the data: it is a prerequisite to develop efficient reconstruction and processing methods and to reduce noise. The deviation from Poisson statistics in PET data could be described by the Conway-Maxwell-Poisson (CMP) distribution model, which is characterized by the centring parameter λ and the dispersion parameter ν, the latter quantifying the deviation from a Poisson distribution model. In particular, the parameter ν allows quantifying over-dispersion (ν<1) or under-dispersion (ν>1) of data. A simple and efficient method for λ and ν parameters estimation is introduced and assessed using Monte Carlo simulation for a wide range of activity values. The application of the method to simulated and experimental PET phantom data demonstrated that the CMP distribution parameters could detect deviation from the Poisson distribution both in raw and corrected PET data. It may be usefully implemented in image reconstruction algorithms and quantitative PET data analysis, especially in low counting emission data, as in dynamic PET data, where the method demonstrated the best accuracy. Copyright © 2016 Elsevier Ltd. All rights reserved.

Effects of chemo-mechanical polishing on CdZnTe X-ray and gamma-ray detectors

DOE PAGES

Egarievwe, Stephen E.; Hossain, Anwar; Okwechime, Ifechukwude O.; ...

2015-06-23

Here, mechanically polishing cadmium zinc telluride (CdZnTe) wafers for x-ray and gamma-ray detectors often is inadequate in removing surface defects caused by cutting them from the ingots. Fabrication-induced defects, such as surface roughness, dangling bonds, and nonstoichiometric surfaces, often are reduced through polishing and etching the surface. In our earlier studies of mechanical polishing with alumina powder, etching with hydrogen bromide in hydrogen peroxide solution, and chemomechanical polishing with bromine–methanol–ethylene glycol solution, we found that the chemomechanical polishing process produced the least surface leakage current. In this research, we focused on using two chemicals to chemomechanically polish CdZnTe wafers aftermore » mechanical polishing, viz. bromine–methanol–ethylene glycol (BME) solution, and hydrogen bromide (HBr) in a hydrogen peroxide and ethylene–glycol solution. We used x-ray photoelectron spectroscopy (XPS), current–voltage (I–V) measurements, and Am-241 spectral response measurements to characterize and compare the effects of each solution. The results show that the HBr-based solution produced lower leakage current than the BME solution. Results from using the same chemomechanical polishing solution on two samples confirmed that the surface treatment affects the measured bulk current (a combination of bulk and surface currents). XPS results indicate that the tellurium oxide to tellurium peak ratios for the mechanical polishing process were reduced significantly by chemomechanical polishing using the BME solution (78.9% for Te 3d 5/2O 2 and 76.7% for Te 3d 3/2O 2) compared with the HBr-based solution (27.6% for Te 3d 5/2O 2 and 35.8% for Te 3d 3/2O 2). Spectral response measurements showed that the 59.5-keV peak of Am-241 remained under the same channel number for all three CdZnTe samples. While the BME-based solution gave a better performance of 7.15% full-width at half-maximum (FWHM) compared with 7.59% FWHM for the HBr-based solution, the latter showed a smaller variation in performance of 0.39% FWHM over 7 days compared with 0.69% for the BME-based solution.« less

Normal contour error measurement on-machine and compensation method for polishing complex surface by MRF

NASA Astrophysics Data System (ADS)

Chen, Hua; Chen, Jihong; Wang, Baorui; Zheng, Yongcheng

2016-10-01

The Magnetorheological finishing (MRF) process, based on the dwell time method with the constant normal spacing for flexible polishing, would bring out the normal contour error in the fine polishing complex surface such as aspheric surface. The normal contour error would change the ribbon's shape and removal characteristics of consistency for MRF. Based on continuously scanning the normal spacing between the workpiece and the finder by the laser range finder, the novel method was put forward to measure the normal contour errors while polishing complex surface on the machining track. The normal contour errors was measured dynamically, by which the workpiece's clamping precision, multi-axis machining NC program and the dynamic performance of the MRF machine were achieved for the verification and security check of the MRF process. The unit for measuring the normal contour errors of complex surface on-machine was designed. Based on the measurement unit's results as feedback to adjust the parameters of the feed forward control and the multi-axis machining, the optimized servo control method was presented to compensate the normal contour errors. The experiment for polishing 180mm × 180mm aspherical workpiece of fused silica by MRF was set up to validate the method. The results show that the normal contour error was controlled in less than 10um. And the PV value of the polished surface accuracy was improved from 0.95λ to 0.09λ under the conditions of the same process parameters. The technology in the paper has been being applied in the PKC600-Q1 MRF machine developed by the China Academe of Engineering Physics for engineering application since 2014. It is being used in the national huge optical engineering for processing the ultra-precision optical parts.

Surface quality of silicon wafer improved by hydrodynamic effect polishing

NASA Astrophysics Data System (ADS)

Peng, Wenqiang; Guan, Chaoliang; Li, Shengyi

2014-08-01

Differing from the traditional pad polishing, hydrodynamic effect polishing (HEP) is non-contact polishing with the wheel floated on the workpiece. A hydrodynamic lubricated film is established between the wheel and the workpiece when the wheel rotates at a certain speed in HEP. Nanoparticles mixed with deionized water are employed as the polishing slurry, and with action of the dynamic pressure, nanoparticles with high chemisorption due to the high specific surface area can easily reacted with the surface atoms forming a linkage with workpiece surface. The surface atoms are dragged away when nanoparticles are transported to separate by the flow shear stress. The development of grand scale integration put extremely high requirements on the surface quality on the silicon wafer with surface roughness at subnanometer and extremely low surface damage. In our experiment a silicon sample was processed by HEP, and the surface topography before and after polishing was observed by the atomic force microscopy. Experiment results show that plastic pits and bumpy structures on the initial surface have been removed away clearly with the removal depth of 140nm by HEP process. The processed surface roughness has been improved from 0.737nm RMS to 0.175nm RMS(10μm×10μm) and the section profile shows peaks of the process surface are almost at the same height. However, the machining ripples on the wheel surface will duplicate on the silicon surface under the action of the hydrodynamic effect. Fluid dynamic simulation demonstrated that the coarse surface on the wheel has greatly influence on the distribution of shear stress and dynamic pressure on the workpiece surface.

Weight discrepancy and body appreciation among women in Poland and Britain.

PubMed

Taylor, Donna; Szpakowska, Ilona; Swami, Viren

2013-09-01

Previous studies have suggested that the process of transmigration has detrimental effects on the body image of migrants relative to women in the country of origin. In the present work, we examined the body image of Polish migrants in Britain (n=153), Polish women in Poland (n=153), and a comparison group of British White women (n=110). Participants completed a measure of actual-ideal weight discrepancy and the Body Appreciation Scale (BAS). Contrary to hypotheses, our results showed that Polish women in Poland had significantly higher weight discrepancy than their counterparts in Britain. Further analyses showed that the BAS reduced to two dimensions among Polish participants, with Polish participants in Poland having significantly lower body appreciation than Polish migrants. We suggest that the sociocultural changes that have taken place in Eastern Europe may place women in that region at relatively high risk for developing negative body image. Copyright © 2013 Elsevier Ltd. All rights reserved.

Measuring Skew in Average Surface Roughness as a Function of Surface Preparation

NASA Technical Reports Server (NTRS)

Stahl, Mark

2015-01-01

Characterizing surface roughness is important for predicting optical performance. Better measurement of surface roughness reduces polishing time, saves money and allows the science requirements to be better defined. This study characterized statistics of average surface roughness as a function of polishing time. Average surface roughness was measured at 81 locations using a Zygo white light interferometer at regular intervals during the polishing process. Each data set was fit to a normal and Largest Extreme Value (LEV) distribution; then tested for goodness of fit. We show that the skew in the average data changes as a function of polishing time.

40 CFR 426.115 - Standards of performance for new sources.

Code of Federal Regulations, 2010 CFR

2010-07-01

... (the fluoride and lead limitations are applicable to the abrasive polishing and acid polishing waste water streams while the TSS, oil, and pH limitations are applicable to the entire process waste water...

STS-112 final main engine is installed after welding/polishing process

NASA Technical Reports Server (NTRS)

2002-01-01

KENNEDY SPACE CENTER, FLA. - Workers get ready to install the last engine in orbiter Atlantis after a welding and polishing process was undertaken on flow liners where cracks were detected. All engines were removed for inspection of flow liners. Atlantis will next fly on mission STS-112, scheduled for launch no earlier than Oct. 2.

Femtosecond laser polishing of optical materials

NASA Astrophysics Data System (ADS)

Taylor, Lauren L.; Qiao, Jun; Qiao, Jie

2015-10-01

Technologies including magnetorheological finishing and CNC polishing are commonly used to finish optical elements, but these methods are often expensive, generate waste through the use of fluids or abrasives, and may not be suited for specific freeform substrates due to the size and shape of finishing tools. Pulsed laser polishing has been demonstrated as a technique capable of achieving nanoscale roughness while offering waste-free fabrication, material-specific processing through direct tuning of laser radiation, and access to freeform shapes using refined beam delivery and focusing techniques. Nanosecond and microsecond pulse duration radiation has been used to perform successful melting-based polishing of a variety of different materials, but this approach leads to extensive heat accumulation resulting in subsurface damage. We have experimentally investigated the ability of femtosecond laser radiation to ablate silicon carbide and silicon. By substituting ultrafast laser radiation, polishing can be performed by direct evaporation of unwanted surface asperities with minimal heating and melting, potentially offering damage-free finishing of materials. Under unoptimized laser processing conditions, thermal effects can occur leading to material oxidation. To investigate these thermal effects, simulation of the heat accumulation mechanism in ultrafast laser ablation was performed. Simulations have been extended to investigate the optimum scanning speed and pulse energy required for processing various substrates. Modeling methodologies and simulation results will be presented.

Novel MRF fluid for ultra-low roughness optical surfaces

NASA Astrophysics Data System (ADS)

Dumas, Paul; McFee, Charles

2014-08-01

Over the past few years there have been an increasing number of applications calling for ultra-low roughness (ULR) surfaces. A critical demand has been driven by EUV optics, EUV photomasks, X-Ray, and high energy laser applications. Achieving ULR results on complex shapes like aspheres and X-Ray mirrors is extremely challenging with conventional polishing techniques. To achieve both tight figure and roughness specifications, substrates typically undergo iterative global and local polishing processes. Typically the local polishing process corrects the figure or flatness but cannot achieve the required surface roughness, whereas the global polishing process produces the required roughness but degrades the figure. Magnetorheological Finishing (MRF) is a local polishing technique based on a magnetically-sensitive fluid that removes material through a shearing mechanism with minimal normal load, thus removing sub-surface damage. The lowest surface roughness produced by current MRF is close to 3 Å RMS. A new ULR MR fluid uses a nano-based cerium as the abrasive in a proprietary aqueous solution, the combination of which reliably produces under 1.5Å RMS roughness on Fused Silica as measured by atomic force microscopy. In addition to the highly convergent figure correction achieved with MRF, we show results of our novel MR fluid achieving <1.5Å RMS roughness on fused silica and other materials.

Path planning and parameter optimization of uniform removal in active feed polishing

NASA Astrophysics Data System (ADS)

Liu, Jian; Wang, Shaozhi; Zhang, Chunlei; Zhang, Linghua; Chen, Huanan

2015-06-01

A high-quality ultrasmooth surface is demanded in short-wave optical systems. However, the existing polishing methods have difficulties meeting the requirement on spherical or aspheric surfaces. As a new kind of small tool polishing method, active feed polishing (AFP) could attain a surface roughness of less than 0.3 nm (RMS) on spherical elements, although AFP may magnify the residual figure error or mid-frequency error. The purpose of this work is to propose an effective algorithm to realize uniform removal of the surface in the processing. At first, the principle of the AFP and the mechanism of the polishing machine are introduced. In order to maintain the processed figure error, a variable pitch spiral path planning algorithm and the dwell time-solving model are proposed. For suppressing the possible mid-frequency error, the uniformity of the synthesis tool path, which is generated by an arbitrary point at the polishing tool bottom, is analyzed and evaluated, and the angular velocity ratio of the tool spinning motion to the revolution motion is optimized. Finally, an experiment is conducted on a convex spherical surface and an ultrasmooth surface is finally acquired. In conclusion, a high-quality ultrasmooth surface can be successfully obtained with little degradation of the figure and mid-frequency errors by the algorithm.

Mechanism analysis on finishing of reaction-sintered silicon carbide by combination of water vapor plasma oxidation and ceria slurry polishing

NASA Astrophysics Data System (ADS)

Shen, Xinmin; Tu, Qunzhang; Deng, Hui; Jiang, Guoliang; Yamamura, Kazuya

2015-05-01

Reaction-sintered silicon carbide (RS-SiC), which is considered as a promising mirror material for space telescope systems, requires a high surface property. An ultrasmooth surface with a Ra surface roughness of 0.480 nm was obtained after water vapor plasma oxidation for 90 min followed by ceria slurry polishing for 40 min. The oxidation process of RS-SiC by water vapor plasma was analyzed based on the Deal-Grove model, and the theoretical calculation results are consistent with the measured data obtained by scanning white light interferometer (SWLI), scanning electron microscopy/energy-dispersive x-ray, and atomic force microscope. The polishing process of oxidized RS-SiC by ceria slurry was investigated according to the Preston equation, which would theoretically forecast the evolutions of RS-SiC surfaces along with the increasing of polishing time, and it was experimentally verified by comparing the surface roughnesses obtained by SWLI and the surface morphologies obtained by SEM. The mechanism analysis on the finishing of RS-SiC would be effective for the optimization of water vapor plasma oxidation parameters and ceria slurry polishing parameters, which will promote the application of RS-SiC substrates by improving the surface property obtained by the oxidation-assisted polishing method.

A study of laser surface treatment in bonded repair of composite aircraft structures.

PubMed

Li, Shaolong; Sun, Ting; Liu, Chang; Yang, Wenfeng; Tang, Qingru

2018-03-01

Surface pre-treatment is one of the key processes in bonded repair of aircraft carbon fibre reinforced polymer composites. This paper investigates the surface modification of physical and chemical properties by laser ablation and conventional polish treatment techniques. Surface morphology analysed by laser scanning confocal microscopy and scanning electron microscopy showed that a laser-treated surface displayed higher roughness than that of a polish-treated specimen. The laser-treated laminate exhibited more functional groups in the form of O 1 s/C 1 s atomic ratio of 30.89% for laser-treated and 20.14% for polish-treated as evidenced by X-ray photoelectron spectroscopy observation. Contact angle goniometry demonstrated that laser treatment can provide increased surface free energy and wettability. In the light of mechanical interlocking, molecular bonding and thermodynamics theories on adhesion, laser etching process displayed enhanced bonding performance relative to the polishing surface treatment. These properties resulted in an increased single lap shear strength and a cohesive failure mode for laser etching while an adhesive failure mode occurred in polish-treated specimen.

A study of laser surface treatment in bonded repair of composite aircraft structures

NASA Astrophysics Data System (ADS)

Li, Shaolong; Sun, Ting; Liu, Chang; Yang, Wenfeng; Tang, Qingru

2018-03-01

Surface pre-treatment is one of the key processes in bonded repair of aircraft carbon fibre reinforced polymer composites. This paper investigates the surface modification of physical and chemical properties by laser ablation and conventional polish treatment techniques. Surface morphology analysed by laser scanning confocal microscopy and scanning electron microscopy showed that a laser-treated surface displayed higher roughness than that of a polish-treated specimen. The laser-treated laminate exhibited more functional groups in the form of O 1 s/C 1 s atomic ratio of 30.89% for laser-treated and 20.14% for polish-treated as evidenced by X-ray photoelectron spectroscopy observation. Contact angle goniometry demonstrated that laser treatment can provide increased surface free energy and wettability. In the light of mechanical interlocking, molecular bonding and thermodynamics theories on adhesion, laser etching process displayed enhanced bonding performance relative to the polishing surface treatment. These properties resulted in an increased single lap shear strength and a cohesive failure mode for laser etching while an adhesive failure mode occurred in polish-treated specimen.

Food additives used in meat processing according to the Polish and European Union legislation.

PubMed

Uradziński, J; Weiner, M

2003-01-01

This paper presents the legal regulations related to the use of food additives in meat production in Poland and the European Union. The Polish legal definition of food additives is given as well as the classification of permitted food additives added to food and stimulants by their technological function. In addition, a definition of processing aids in the food industry is included. It shows that Polish legislation includes food additives used to ensure or improve food nutritional value, whereas in the EU legislation, these substances are not included in the list of food additives. Moreover, the Council Directives include food additive specific purity criteria, whereas the Polish regulations do not mention the legal regulations of this issue in practice. The European Union use mechanisms and procedures for the introduction of new food additives into internal markets as well as controlling the circulation of additives. The Polish legislation in practice, however, does not determine approval or methods for the introduction of new food additives to the market. Legal regulations on the monitoring of food additives no exist.

A study of laser surface treatment in bonded repair of composite aircraft structures

PubMed Central

Sun, Ting; Liu, Chang; Yang, Wenfeng; Tang, Qingru

2018-01-01

Surface pre-treatment is one of the key processes in bonded repair of aircraft carbon fibre reinforced polymer composites. This paper investigates the surface modification of physical and chemical properties by laser ablation and conventional polish treatment techniques. Surface morphology analysed by laser scanning confocal microscopy and scanning electron microscopy showed that a laser-treated surface displayed higher roughness than that of a polish-treated specimen. The laser-treated laminate exhibited more functional groups in the form of O 1 s/C 1 s atomic ratio of 30.89% for laser-treated and 20.14% for polish-treated as evidenced by X-ray photoelectron spectroscopy observation. Contact angle goniometry demonstrated that laser treatment can provide increased surface free energy and wettability. In the light of mechanical interlocking, molecular bonding and thermodynamics theories on adhesion, laser etching process displayed enhanced bonding performance relative to the polishing surface treatment. These properties resulted in an increased single lap shear strength and a cohesive failure mode for laser etching while an adhesive failure mode occurred in polish-treated specimen. PMID:29657748

Polishing of silicon based advanced ceramics

NASA Astrophysics Data System (ADS)

Klocke, Fritz; Dambon, Olaf; Zunke, Richard; Waechter, D.

2009-05-01

Silicon based advanced ceramics show advantages in comparison to other materials due to their extreme hardness, wear and creep resistance, low density and low coefficient of thermal expansion. As a matter of course, machining requires high efforts. In order to reach demanded low roughness for optical or tribological applications a defect free surface is indispensable. In this paper, polishing of silicon nitride and silicon carbide is investigated. The objective is to elaborate scientific understanding of the process interactions. Based on this knowledge, the optimization of removal rate, surface quality and form accuracy can be realized. For this purpose, fundamental investigations of polishing silicon based ceramics are undertaken and evaluated. Former scientific publications discuss removal mechanisms and wear behavior, but the scientific insight is mainly based on investigations in grinding and lapping. The removal mechanisms in polishing are not fully understood due to complexity of interactions. The role of, e.g., process parameters, slurry and abrasives, and their influence on the output parameters is still uncertain. Extensive technological investigations demonstrate the influence of the polishing system and the machining parameters on the stability and the reproducibility. It is shown that the interactions between the advanced ceramics and the polishing systems is of great relevance. Depending on the kind of slurry and polishing agent the material removal mechanisms differ. The observed effects can be explained by dominating mechanical or chemo-mechanical removal mechanisms. Therefore, hypotheses to state adequate explanations are presented and validated by advanced metrology devices, such as SEM, AFM and TEM.

Influence of mechanical and chemical polishing in the solubility of acrylic resins polymerized by microwave irradiation and conventional water bath.

PubMed

Machado, Cristiane; Rizzatti-Barbosa, Célia M; Gabriotti, Morgana N; Joia, Fábio A; Ribeiro, Margarete C; Sousa, Rodrigo L S

2004-07-01

The aim of this work was to evaluate the solubility of acrylic resin activated by microwave irradiation (MI) or water bath (WB), when submitted to chemical (CP) or mechanical (MP) polishing. Forty acrylic resin samples were made and processed either by water bath (74 +/- 1 degrees C, 9 h) or microwave irradiation (500 W, 3 min). After deflasking, the samples were finished with aluminum oxide sandpapers in decreasing granulations till reaching similar dimensions. The samples were divided into four groups according to the association between kind of polymerization and polishing: A (WB + CP), B (WB + MP), C (MI + CP) and D (MI + MP). Solubility test was performed for each group and percentile solubility was calculated. Data were statistically analyzed using variance analysis and Kruskal-Wallis. The average of percentile solubility (%) was obtained: A = 0.07, B = 0.02, C = 0.04, D = -0.14, however, no significant difference was found between types of polishing in the samples polymerized by water bath (A and B). When processed by microwave irradiation (C and D), there was significant difference between the applied methods of polishing, so that mechanical polishing lead to a lower solubility. Solubility is a property of acrylic resins, representing not reacted substances releasing that could promote tissular reactions in prosthesis users. The association between polymerization by microwave irradiation and mechanical polishing showed less residual substances releasing for heat-cured acrylic resins, reducing the probability of developing tissular reactions.

New surface smoothing technologies for manufacturing of complex shaped glass components

NASA Astrophysics Data System (ADS)

Henkel, Sebastian; Schwager, Anne-Marie; Bliedtner, Jens; Götze, Kerstin; Rädlein, Edda; Schulze, Christian; Gerhardt, Martin; Fuhr, Michael

2017-10-01

The production of complex glass components with 2.5D or 3D-structures involves great effort and the need for advanced CNC-technology. Especially the final surface treatment, for generation of transparent surfaces, represents a timeconsuming and costly process. The ultrasonic-assisted grinding procedure is used to generate arbitrary shaped components and freeform-surfaces. The special kinematic principle, containing a high-frequency tool oscillation, enables efficient manufacturing processes. Surfaces produced in this way allow for application of novel smoothing methods, providing considerable advantages compared to classic polishing. It is shown, that manufacturing of transparent glass surfaces with low roughness down to Rq = 10 nm is possible, using an ultra-fine grinding process. By adding a CO2-laser polishing process, roughness can be reduced even further with a very short polishing time.

Tetraphenylethylene-Interweaving Conjugated Macrocycle Polymer Materials as Two-Photon Fluorescence Sensors for Metal Ions and Organic Molecules.

PubMed

Li, Xi; Li, Zheng; Yang, Ying-Wei

2018-05-01

A luminescent conjugated macrocycle polymer (CMP) with strong two-photon fluorescence property, namely, P[5]-TPE-CMP, is constructed from ditriflate-functionalized pillar[5]arene and a 1,1,2,2-tetrakis(4-ethynylphenyl)ethylene (TPE) linker through a Sonogashira-Hagihara cross-coupling reaction. Significantly, in sharp contrast with the corresponding conjugated microporous polymer without synthetic macrocycles, P[5]-TPE-CMP shows an outstanding stability against photobleaching and exhibits highly selective cation sensing capability toward Fe 3+ at different excitation wavelengths (both UV and red-near-infrared regions). Meanwhile, its fluorescence could also be sufficiently quenched by 4-amino azobenzene, a frequently used organic dye that is certified to be carcinogenic, as compared with a group of common organic compounds. This work paves a new way for enhancing the properties of porous organic polymers through the introduction of supramolecular macrocycles like macrocyclic arenes. © 2018 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Development of chitosan-pullulan composite nanoparticles for nasal delivery of vaccines: in vivo studies.

PubMed

Cevher, Erdal; Salomon, Stefan K; Somavarapu, Satyanarayana; Brocchini, Steve; Alpar, H Oya

2015-01-01

Here, we aimed at developing chitosan/pullulan composite nanoparticles and testing their potential as novel systems for the nasal delivery of diphtheria toxoid (DT). All the chitosan derivatives [N-trimethyl (TMC), chloride and glutamate] and carboxymethyl pullulan (CMP) were synthesised and antigen-loaded composites were prepared by polyion complexation of chitosan and pullulan derivatives (particle size: 239-405 nm; surface charge: +18 and +27 mV). Their immunological effects after intranasal administration to mice were compared to intramuscular route. Composite nanoparticles induced higher levels of IgG responses than particles formed with chitosan derivative and antigen. Nasally administered TMC-pullulan composites showed higher DT serum IgG titre when compared with the other composites. Co-encapsulation of CpG ODN within TMC-CMP-DT nanoparticles resulted in a balanced Th1/Th2 response. TMC/pullulan composite nanoparticles also induced highest cytokine levels compared to those of chitosan salts. These findings demonstrated that TMC-CMP-DT composite nanoparticles are promising delivery system for nasal vaccination.

Recent results on output feedback problems

NASA Technical Reports Server (NTRS)

Byrnes, C. I.

1980-01-01

Given a real linear system sigma = (A, B, C) with m inputs, p outputs and degree n, the problem of generic pole placement by output feedback is studied, which is to compute the constant C(m,p) such that the inequality C(m,p) not less than n is necessary and sufficient for generically positioning the poles of the generic linear system by constant output feedback. A constant C prime (m,p) is determined, which gives a sufficient condition for generic pole placement and which, to the best of the author's knowledge, is at least as good an estimate of C(m,p) as any in the literature. Some results on the construction of solutions in case mp = n are announced, based on the degree formula of Brockett and Byrnes and the Galois theory. In particular, a question raised by Anderson, Bose, and Jury, on the existence of a rational procedure for computing the feedback law from the desired characteristic polynomial is answered.

Benzotriazole removal on post-Cu CMP cleaning

NASA Astrophysics Data System (ADS)

Jiying, Tang; Yuling, Liu; Ming, Sun; Shiyan, Fan; Yan, Li

2015-06-01

This work investigates systematically the effect of FA/O II chelating agent and FA/O I surfactant in alkaline cleaning solutions on benzotriazole (BTA) removal during post-Cu CMP cleaning in GLSI under the condition of static etching. The best detergent formulation for BTA removal can be determined by optimization of the experiments of single factor and compound cleaning solution, which has been further confirmed experimentally by contact angle (CA) measurements. The resulting solution with the best formulation has been measured for the actual production line, and the results demonstrate that the obtained cleaning solution can effectively and efficiently remove BTA, CuO and abrasive SiO2 without basically causing interfacial corrosion. This work demonstrates the possibility of developing a simple, low-cost and environmentally-friendly cleaning solution to effectively solve the issues of BTA removal on post-Cu CMP cleaning in a multi-layered copper wafer. Project supported by the Major National Science and Technology Special Projects (No. 2009ZX02308).

Enhancing Surface Finish of Additively Manufactured Titanium and Cobalt Chrome Elements Using Laser Based Finishing

NASA Astrophysics Data System (ADS)

Gora, Wojciech S.; Tian, Yingtao; Cabo, Aldara Pan; Ardron, Marcus; Maier, Robert R. J.; Prangnell, Philip; Weston, Nicholas J.; Hand, Duncan P.

Additive manufacturing (AM) offers the possibility of creating a complex free form object as a single element, which is not possible using traditional mechanical machining. Unfortunately the typically rough surface finish of additively manufactured parts is unsuitable for many applications. As a result AM parts must be post-processed; typically mechanically machined and/or and polished using either chemical or mechanical techniques (both of which have their limitations). Laser based polishing is based on remelting of a very thin surface layer and it offers potential as a highly repeatable, higher speed process capable of selective area polishing, and without any waste problems (no abrasives or liquids). In this paper an in-depth investigation of CW laser polishing of titanium and cobalt chrome AM elements is presented. The impact of different scanning strategies, laser parameters and initial surface condition on the achieved surface finish is evaluated.

Research on laser-induced damage resistance of fused silica optics by the fluid jet polishing method.

PubMed

Lv, Liang; Ma, Ping; Huang, Jinyong; He, Xiang; Cai, Chao; Zhu, Heng

2016-03-20

Laser-induced damage threshold (LIDT) is one important evaluation index for optical glasses applied in large laser instruments which are exposed to high light irradiation flux. As a new kind of precise polishing technology, fluid jet polishing (FJP) has been widely used in generating planar, spherical, and aspherical optics with high-accuracy surfaces. Laser damage resistances of fused silica optics by the FJP process are studied in this paper. Fused silica samples with various FJP parameters are prepared, and laser damage experiments are performed with 351 nm wavelength and a 5.5 ns pulse width laser. Experimental results demonstrate that the LIDT of the samples treated with FJP processes did not increase, compared to their original state. The surface quality of the samples is one factor for the decrease of LIDT. For ceria solution polished samples, the cerium element remaining is another factor of the lower LIDT.

Customers' perspectives on the impact of the Pathways to Work condition management programme on their health, well-being and vocational activity.

PubMed

Secker, Jenny; Pittam, Gail; Ford, Fiona

2012-11-01

Pathways to Work is a UK initiative aimed at supporting customers on incapacity benefits to return to work. This qualitative study complements previous evaluations of Pathways to Work by exploring customers' perceptions of the impact of the Condition Management Programme (CMP) offered to claimants with long-term health conditions. 39 customers took part in focus groups held at the seven sites where Pathways was originally piloted. The main focus of the discussions was on perceptions of the ways in which participation had impacted on health, well-being and return to work. The discussions were audio-recorded and fully transcribed for analysis using a text analysis framework to enable the development and refinement of categories and overarching patterns in the data. Perceived impacts on health and well-being included a more positive outlook, social contact, changed perceptions of conditions and improvements in health. Some customers also reported an increase in their vocational activity and others felt ready to embark on new activities. Factors associated with positive outcomes included the extent and quality of contact with CMP staff and practical advice about condition management. Factors impeding positive employment outcomes related mainly to obstacles to returning to work. The results indicated that CMP can assist customers to learn about and manage their health conditions and increase their vocational activity, and that CMP therefore provides a promising means of enabling people with long-term health conditions to regain a fulfilling, productive life.

[Zionists to Zion].

PubMed

Syroka, Bozena Płonka

2006-01-01

The issue of presence of doctors of Jewish origin in Polish medical community is the subject of research presented in this article. The author describes the most important personalities originating from this national group, who had the biggest contribution to Polish modern times medical life. The process of Jewish minority assimilation to Polish culture in 18th and 19th centuries is outlined, as well as its effects in reborn Poland. Also, the Jewish minority situation during the Second World War is describes, and the harm they suffered then. Against this background the author shows the anti-Semitic trends visible in Polish political life in times of Polish People's Republic, especially during the 1968 upheavals, which greatly contributed to the fact that many doctors of medicine of Jewish origin emigrated from Poland for political reasons.

STS-112 final main engine is installed after welding/polishing process

NASA Technical Reports Server (NTRS)

2002-01-01

KENNEDY SPACE CENTER, FLA. -- Workers on the engine lift get ready to install the last engine in orbiter Atlantis after a welding and polishing process was undertaken on flow liners where cracks were detected. All engines were removed for inspection of flow liners. Atlantis will next fly on mission STS-112, scheduled for launch no earlier than Oct. 2.

Family therapy process - works on the Polish version of SCORE-15 tool.

PubMed

Józefik, Barbara; Matusiak, Feliks; Wolska, Małgorzata; Ulasińska, Romualda

2016-01-01

The aim of the paper is to demonstrate progress of the works on the Polish version of SCORE-15 and the results of the preliminary data analysis of changes in the process of family therapy, obtained with this tool. The works on the Polish version, ongoing since 2010, were inspired by the Research Committee European Family Therapy Association EFTA. Since the Polish version of SCORE-15 will be make public and published on EFTA website in the near future, therefore, it is important that people interested in the tool know the context of its development. The Polish version of SCORE-15, the tool designed to examine the process of family therapy, was used. The comparison of the results obtained by family members before the first family session and before the fourth one and psychotherapists' assessments show that the perception of the weight of the problem with which the family members came to therapy is indeed significantly lower already after three sessions of family therapy. Additionally, the obtained results show great coherence of the assessment of the family therapy progress in families and their therapists. The preliminary analysis of data obtained during the research project conducted in Outpatient Family Therapy Clinic, Department of Adult, Child and Adolescent Psychiatry, University Hospital in Krakow and in Laboratory of Psychology and Systemic Psychotherapy, Department of Child and Adolescent Psychiatry, Jagiellonian University Medical College between 2010 and 2014 revealed that SCORE-15 is a useful tool in research on changes in the systemic family therapy process.

The Electronic CardioMetabolic Program (eCMP) for Patients With Cardiometabolic Risk: A Randomized Controlled Trial.

PubMed

Azar, Kristen M J; Koliwad, Suneil; Poon, Tak; Xiao, Lan; Lv, Nan; Griggs, Robert; Ma, Jun

2016-05-27

Effective lifestyle interventions targeting high-risk adults that are both practical for use in ambulatory care settings and scalable at a population management level are needed. Our aim was to examine the potential effectiveness, feasibility, and acceptability of delivering an evidence-based Electronic Cardio-Metabolic Program (eCMP) for improving health-related quality of life, improving health behaviors, and reducing cardiometabolic risk factors in ambulatory care high-risk adults. We conducted a randomized, wait-list controlled trial with 74 adults aged ≥18 years recruited from a large multispecialty health care organization. Inclusion criteria were (1) BMI ≥35 kg/m(2) and prediabetes, previous gestational diabetes and/or metabolic syndrome, or (2) BMI ≥30 kg/m(2) and type 2 diabetes and/or cardiovascular disease. Participants had a mean age of 59.7 years (SD 11.2), BMI 37.1 kg/m(2) (SD 5.4) and were 59.5% female, 82.4% white. Participants were randomized to participate in eCMP immediately (n=37) or 3 months later (n=37). eCMP is a 6-month program utilizing video conferencing, online tools, and pre-recorded didactic videos to deliver evidence-based curricula. Blinded outcome assessments were conducted at 3 and 6 months postbaseline. Data were collected and analyzed between 2014 and 2015. The primary outcome was health-related quality of life. Secondary outcomes included biometric cardiometabolic risk factors (eg, body weight), self-reported diet and physical activity, mental health status, retention, session attendance, and participant satisfaction. Change in quality of life was not significant in both immediate and delayed participants. Both groups significantly lost weight and reduced waist circumference at 6 months, with some cardiometabolic factors trending accordingly. Significant reduction in self-reported anxiety and perceived stress was seen in the immediate intervention group at 6 months. Retention rate was 93% at 3 months and 86% at 6 months post-baseline. Overall eCMP attendance was high with 59.5-83.8% of immediate and delayed intervention participants attending 50% of the virtual stress management and behavioral lifestyle sessions and 37.8-62.2% attending at least 4 out of 7 in-person physical activity sessions. The intervention received high ratings for satisfaction. The technology-assisted eCMP is a feasible and well-accepted intervention and may significantly decrease cardiometabolic risk among high-risk individuals. Clinicaltrials.gov NCT02246400; https://clinicaltrials.gov/ct2/show/NCT02246400 (Archived by WebCite at http://www.webcitation.org/6h6mWWokP).

The Effect of Hole Quality on the Fatigue Life of 2024-T3 Aluminum Alloy Sheet

NASA Technical Reports Server (NTRS)

Everett, Richard A., Jr.

2004-01-01

This paper presents the results of a study whose main objective was to determine which type of fabrication process would least affect the fatigue life of an open-hole structural detail. Since the open-hole detail is often the fundamental building block for determining the stress concentration of built-up structural parts, it is important to understand any factor that can affect the fatigue life of an open hole. A test program of constant-amplitude fatigue tests was conducted on five different sets of test specimens each made using a different hole fabrication process. Three of the sets used different mechanical drilling procedures while a fourth and fifth set were mechanically drilled and then chemically polished. Two sets of specimens were also tested under spectrum loading to aid in understanding the effects of residual compressive stresses on fatigue life. Three conclusions were made from this study. One, the residual compressive stresses caused by the hole-drilling process increased the fatigue life by two to three times over specimens that were chemically polished after the holes were drilled. Second, the chemical polishing process does not appear to adversely affect the fatigue life. Third, the chemical polishing process will produce a stress-state adjacent to the hole that has insignificant machining residual stresses.

Experimental power spectral density analysis for mid- to high-spatial frequency surface error control.

PubMed

Hoyo, Javier Del; Choi, Heejoo; Burge, James H; Kim, Geon-Hee; Kim, Dae Wook

2017-06-20

The control of surface errors as a function of spatial frequency is critical during the fabrication of modern optical systems. A large-scale surface figure error is controlled by a guided removal process, such as computer-controlled optical surfacing. Smaller-scale surface errors are controlled by polishing process parameters. Surface errors of only a few millimeters may degrade the performance of an optical system, causing background noise from scattered light and reducing imaging contrast for large optical systems. Conventionally, the microsurface roughness is often given by the root mean square at a high spatial frequency range, with errors within a 0.5×0.5  mm local surface map with 500×500 pixels. This surface specification is not adequate to fully describe the characteristics for advanced optical systems. The process for controlling and minimizing mid- to high-spatial frequency surface errors with periods of up to ∼2-3  mm was investigated for many optical fabrication conditions using the measured surface power spectral density (PSD) of a finished Zerodur optical surface. Then, the surface PSD was systematically related to various fabrication process parameters, such as the grinding methods, polishing interface materials, and polishing compounds. The retraceable experimental polishing conditions and processes used to produce an optimal optical surface PSD are presented.

Measuring Skew in Average Surface Roughness as a Function of Surface Preparation

NASA Technical Reports Server (NTRS)

Stahl, Mark T.

2015-01-01

Characterizing surface roughness is important for predicting optical performance. Better measurement of surface roughness reduces grinding saving both time and money and allows the science requirements to be better defined. In this study various materials are polished from a fine grind to a fine polish. Each sample's RMS surface roughness is measured at 81 locations in a 9x9 square grid using a Zygo white light interferometer at regular intervals during the polishing process. Each data set is fit with various standard distributions and tested for goodness of fit. We show that the skew in the RMS data changes as a function of polishing time.

Measuring skew in average surface roughness as a function of surface preparation

NASA Astrophysics Data System (ADS)

Stahl, Mark T.

2015-08-01

Characterizing surface roughness is important for predicting optical performance. Better measurement of surface roughness reduces polishing time, saves money and allows the science requirements to be better defined. This study characterized statistics of average surface roughness as a function of polishing time. Average surface roughness was measured at 81 locations using a Zygo® white light interferometer at regular intervals during the polishing process. Each data set was fit to a normal and Largest Extreme Value (LEV) distribution; then tested for goodness of fit. We show that the skew in the average data changes as a function of polishing time.

Polishing performance of multiple-use silicone rubber-based polishing instruments with and without disinfection/sterilization.

PubMed

Heintze, Siegward Dietmar; Forjanic, Monika

2008-10-01

To evaluate the effect of the multiple-use of a three-step rubber-based polishing system on the polishing performance with and without a disinfection/sterilization protocol with prolonged disinfection (overnight). The three-step polishing system Astropol was applied under standardized contact pressure of 2 N on 320 grit pre-roughened flat composite specimens of Tetric EvoCeram for 10 seconds (F and P disc) and 30 seconds (HP disc) respectively. After each polishing step, the surface gloss and roughness were measured with a glossmeter and an optical sensor (FRT MicroProf), respectively. Material loss of the composite specimens and polishing instruments were measured after each step with a high precision digital scale. For all four variables (surface gloss, surface roughness, composite loss, loss of rubber material) the mean percentage of change compared to the reference was calculated. Already after the first use, the instruments which were used without disinfection or sterilization demonstrated a statistically significantly reduced polishing performance in all polishing steps compared to the reference (new polishing system) (t-test, P < 0.05). In addition, this loss in performance further increased with the second and third re-use. Especially the third component (Astropol HP) was affected by performance loss. By contrast, the multiple-use of the instruments which were subjected to prolonged disinfection did not result in a reduced polishing performance. For the P disc, a statistically significant improvement of the polishing performance could be observed throughout almost all multiple-use sessions (ANOVA, P < 0.05). The improved polishing performance was, however, accompanied by an increased loss of the silicone rubber material of the P and F polishing discs; the HP discs were not affected by this loss. Furthermore, particles of the rubber material also adhered to the composite. The polishing performance of the discs which were only subjected to the sterilization process was not statistically significantly different to the polishing performance of the control group in terms of surface roughness; but the surface gloss was worse than that of the control group. No loss of rubber material or adherence to the composite was observed in this group.

In vitro cytotoxicity and surface topography evaluation of additive manufacturing titanium implant materials.

PubMed

Tuomi, Jukka T; Björkstrand, Roy V; Pernu, Mikael L; Salmi, Mika V J; Huotilainen, Eero I; Wolff, Jan E H; Vallittu, Pekka K; Mäkitie, Antti A

2017-03-01

Custom-designed patient-specific implants and reconstruction plates are to date commonly manufactured using two different additive manufacturing (AM) technologies: direct metal laser sintering (DMLS) and electron beam melting (EBM). The purpose of this investigation was to characterize the surface structure and to assess the cytotoxicity of titanium alloys processed using DMLS and EBM technologies as the existing information on these issues is scarce. "Processed" and "polished" DMLS and EBM disks were assessed. Microscopic examination revealed titanium alloy particles and surface flaws on the processed materials. These surface flaws were subsequently removed by polishing. Surface roughness of EBM processed titanium was higher than that of DMLS processed. The cytotoxicity results of the DMLS and EBM discs were compared with a "gold standard" commercially available titanium mandible reconstruction plate. The mean cell viability for all discs was 82.6% (range, 77.4 to 89.7) and 83.3% for the control reconstruction plate. The DMLS and EBM manufactured titanium plates were non-cytotoxic both in "processed" and in "polished" forms.

Effects of wet etch processing on laser-induced damage of fused silica surfaces

DOE Office of Scientific and Technical Information (OSTI.GOV)

Battersby, C.L.; Kozlowski, M.R.; Sheehan, L.M.

1998-12-22

Laser-induced damage of transparent fused silica optical components by 355 nm illumination occurs primarily at surface defects produced during the grinding and polishing processes. These defects can either be surface defects or sub-surface damage.Wet etch processing in a buffered hydrogen fluoride (HF) solution has been examined as a tool for characterizing such defects. A study was conducted to understand the effects of etch depth on the damage threshold of fused silica substrates. The study used a 355 nm, 7.5 ns, 10 Hz Nd:YAG laser to damage test fused silica optics through various wet etch processing steps. Inspection of the surfacemore » quality was performed with Nomarski microscopy and Total Internal Reflection Microscopy. The damage test data and inspection results were correlated with polishing process specifics. The results show that a wet etch exposes subsurface damage while maintaining or improving the laser damage performance. The benefits of a wet etch must be evaluated for each polishing process.« less

Quantification of microscopic surface features of single point diamond turned optics with subsequent chemical polishing

NASA Astrophysics Data System (ADS)

Cardenas, Nelson; Kyrish, Matthew; Taylor, Daniel; Fraelich, Margaret; Lechuga, Oscar; Claytor, Richard; Claytor, Nelson

2015-03-01

Electro-Chemical Polishing is routinely used in the anodizing industry to achieve specular surface finishes of various metals products prior to anodizing. Electro-Chemical polishing functions by leveling the microscopic peaks and valleys of the substrate, thereby increasing specularity and reducing light scattering. The rate of attack is dependent of the physical characteristics (height, depth, and width) of the microscopic structures that constitute the surface finish. To prepare the sample, mechanical polishing such as buffing or grinding is typically required before etching. This type of mechanical polishing produces random microscopic structures at varying depths and widths, thus the electropolishing parameters are determined in an ad hoc basis. Alternatively, single point diamond turning offers excellent repeatability and highly specific control of substrate polishing parameters. While polishing, the diamond tool leaves behind an associated tool mark, which is related to the diamond tool geometry and machining parameters. Machine parameters such as tool cutting depth, speed and step over can be changed in situ, thus providing control of the spatial frequency of the microscopic structures characteristic of the surface topography of the substrate. By combining single point diamond turning with subsequent electro-chemical etching, ultra smooth polishing of both rotationally symmetric and free form mirrors and molds is possible. Additionally, machining parameters can be set to optimize post polishing for increased surface quality and reduced processing times. In this work, we present a study of substrate surface finish based on diamond turning tool mark spatial frequency with subsequent electro-chemical polishing.

Impacts of feedlot floor condition, deposition frequency, and inhibitors on N2O and CH4 emissions from feedlot dung and urine patches.

PubMed

Liao, Wenhua; Liu, Chunjing; Gao, Zhiling

2018-04-09

Patches of dung and urine are major contributors to the feedlot gas emissions. This study investigated the impacts of dung deposition frequency (partly reflecting animal stocking density of a feedlot), dairy feedlot floor conditions (old floor indicated with the presence of consolidated manure pad [CMP] vs. new floor with the absence of consolidated manure pad [CMPn]), and application of dicyandiamide (DCD) and hydroquinone (HQ) on nitrous oxide (N 2 O) and methane (CH 4 ) emissions from patches in the laboratory, and the integrative impacts were expressed in terms of global warming potential (CO 2 -equivalent). Dung deposition frequency, feedlot floor condition, and application of inhibitors showed inverse impacts on N 2 O and CH 4 emissions from patches. Greenhouse gas (GHG) emissions from the dung, urine, and dung+urine patches on the CMP feedlot surface were approximately 7.48, 87.35, and 7.10 times those on the CMPn feedlot surface (P < 0.05). Meanwhile, GHG emissions from CMP and CMPn feedlot surfaces under high deposition frequency condition were approximately 10 and 1.7 times those under low-frequency condition. Moreover, application of HQ slightly reduced the GHG emission from urine patches, by 14.9% (P > 0.05), while applying DCD or DCD+HQ significantly reduced the GHG, by 60.3% and 65.0%, respectively (P < 0.05). Overall, it is necessary to include feedlot management such as animal stocking density and feedlot floor condition to the process of determining emission factors for feedlots. In the future, field measurements to quantitatively evaluate the relative contribution of nitrification and denitrification to the N 2 O emissions of feedlot surfaces are highly required for effective N 2 O control. This study shows that feedlot CH 4 and N 2 O emissions inversely respond to the dicyandiamide (DCD) application. Applying DCD significantly reduces GHG emissions of feedlot urine patches. Feedlot floor condition and stocking density strongly impact feedlot GHG emissions. Including feedlot floor condition and stocking density in the feedlot EF determining process is necessary.

Soluble minerals in chemical evolution. II - Characterization of the adsorption of 5-prime-AMP and 5-prime-CMP on a variety of soluble mineral salts

NASA Technical Reports Server (NTRS)

Chan, Stephen; Orenberg, James; Lahav, Noam

1987-01-01

The adsorption of 5-prime-AMP and 5-prime-CMP is studied in the saturated solutions of several mineral salts as a function of pH, ionic strength, and surface area of the solid salt. It is suggested that the adsorption which results from the binding between the nucleotide molecule and the salt surface is due to electrostatic forces. The adsorption is reversible in nature and decreases with increasing ionic strength.

Trend and current practices of palm oil mill effluent polishing: Application of advanced oxidation processes and their future perspectives.

PubMed

Bello, Mustapha Mohammed; Abdul Raman, Abdul Aziz

2017-08-01

Palm oil processing is a multi-stage operation which generates large amount of effluent. On average, palm oil mill effluent (POME) may contain up to 51, 000 mg/L COD, 25,000 mg/L BOD, 40,000 TS and 6000 mg/L oil and grease. Due to its potential to cause environmental pollution, palm oil mills are required to treat the effluent prior to discharge. Biological treatments using open ponding system are widely used for POME treatment. Although these processes are capable of reducing the pollutant concentrations, they require long hydraulic retention time and large space, with the effluent frequently failing to satisfy the discharge regulation. Due to more stringent environmental regulations, research interest has recently shifted to the development of polishing technologies for the biologically-treated POME. Various technologies such as advanced oxidation processes, membrane technology, adsorption and coagulation have been investigated. Among these, advanced oxidation processes have shown potentials as polishing technologies for POME. This paper offers an overview on the POME polishing technologies, with particularly emphasis on advanced oxidation processes and their prospects for large scale applications. Although there are some challenges in large scale applications of these technologies, this review offers some perspectives that could help in overcoming these challenges. Copyright © 2017 Elsevier Ltd. All rights reserved.

Otolith Trace Element Chemistry of Juvenile Black Rockfish

NASA Astrophysics Data System (ADS)

Hardin, W.; Bobko, S. J.; Jones, C. M.

2002-12-01

In the summer of 1997 we collected young-of -the-year (YOY) black rockfish, Sebastes melanops, from floating docks and seagrass beds in Newport and Coos Bay, Oregon. Otoliths were extracted from randomly selected fish, sectioned and polished under general laboratory conditions, and cleaned in a class 100 clean room. We used Laser Ablation - Inductively Coupled Mass Spectrometry (LA-ICPMS) to analyze elemental composition of the estuarine phase of the otoliths. While we observed differences in Mn/Ca ratios between the two estuaries, there was no statistical difference in otolith trace element chemistry ratios between estuaries using MANOVA. To determine if laboratory processing of otoliths might have impeded us from detecting differences in otolith chemistry, we conducted a second experiment. Right and left otoliths from 10 additional Coos Bay fish were randomly allocated to two processing methods. The first method was identical to our initial otolith processing, sectioning and polishing under normal laboratory conditions. In the second method, polishing was done in the clean room. For both methods otoliths went through a final cleaning in the clean room and analyzed with LA-ICPMS. While we did not detect statistical differences in element ratios between the two methods, otoliths polished outside the clean room had much higher variances. This increased variance might have lowered our ability to detect differences in otolith chemistry between estuaries. Based on our results, we recommend polishing otoliths under clean room conditions to reduce contamination.

Zirconia coated carbonyl iron particle-based magnetorheological fluid for polishing

NASA Astrophysics Data System (ADS)

Shafrir, Shai N.; Romanofsky, Henry J.; Skarlinski, Michael; Wang, Mimi; Miao, Chunlin; Salzman, Sivan; Chartier, Taylor; Mici, Joni; Lambropoulos, John C.; Shen, Rui; Yang, Hong; Jacobs, Stephen D.

2009-08-01

Aqueous magnetorheological (MR) polishing fluids used in magnetorheological finishing (MRF) have a high solids concentration consisting of magnetic carbonyl iron particles and nonmagnetic polishing abrasives. The properties of MR polishing fluids are affected over time by corrosion of CI particles. Here we report on MRF spotting experiments performed on optical glasses using a zirconia coated carbonyl iron (CI) particle-based MR fluid. The zirconia coated magnetic CI particles were prepared via sol-gel synthesis in kg quantities. The coating layer was ~50-100 nm thick, faceted in surface structure, and well adhered. Coated particles showed long term stability against aqueous corrosion. "Free" nano-crystalline zirconia polishing abrasives were co-generated in the coating process, resulting in an abrasivecharged powder for MRF. A viable MR fluid was prepared simply by adding water. Spot polishing tests were performed on a variety of optical glasses over a period of 3 weeks with no signs of MR fluid degradation or corrosion. Stable material removal rates and smooth surfaces inside spots were obtained.

Understanding the creation of & reducing surface microroughness during polishing & post-processing of glass optics

DOE Office of Scientific and Technical Information (OSTI.GOV)

Suratwala, Tayyab

2016-09-22

In the follow study, we have developed a detailed understanding of the chemical and mechanical microscopic interactions that occur during polishing affecting the resulting surface microroughness of the workpiece. Through targeted experiments and modeling, the quantitative relationships of many important polishing parameters & characteristics affecting surface microroughness have been determined. These behaviors and phenomena have been described by a number of models including: (a) the Ensemble Hertzian Multi Gap (EHMG) model used to predict the removal rate and roughness at atomic force microscope (AFM) scale lengths as a function of various polishing parameters, (b) the Island Distribution Gap (IDG) modelmore » used to predict the roughness at larger scale lengths, (c) the Deraguin-Verwey-Landau-Overbeek (DLVO) 3-body electrostatic colloidal model used to predict the interaction of slurry particles at the interface and roughness behavior as a function of pH, and (d) a diffusion/chemical reaction rate model of the incorporation of impurities species into the polishing surface layer (called the Bielby layer). Based on this improved understanding, novel strategies to polish the workpiece have been developed simultaneously leading to both ultrasmooth surfaces and high material removal rates. Some of these strategies include: (a) use of narrow PSD slurries, (b) a novel diamond conditioning recipe of the lap to increase the active contact area between the workpiece and lap without destroying its surface figure, (c) proper control of pH for a given glass type to allow for a uniform distribution of slurry particles at the interface, and (d) increase in applied load just up to the transition between molecular to plastic removal regime for a single slurry particle. These techniques have been incorporated into a previously developed finishing process called Convergent Polishing leading to not just economical finishing process with improved surface figure control, but also simultaneously leading to low roughness surface with high removal rates.« less

PLUTONIUM PROCESSING OPTIMIZATION IN SUPPORT OF THE MOX FUEL PROGRAM

DOE Office of Scientific and Technical Information (OSTI.GOV)

GRAY, DEVIN W.; COSTA, DAVID A.

2007-02-02

After Los Alamos National Laboratory (LANL) personnel completed polishing 125 Kg of plutonium as highly purified PuO{sub 2} from surplus nuclear weapons, Duke, COGEMA, Stone, and Webster (DCS) required as the next process stage, the validation and optimization of all phases of the plutonium polishing flow sheet. Personnel will develop the optimized parameters for use in the upcoming 330 kg production mission.

JPRS Report, East Europe

DTIC Science & Technology

1988-05-03

thrift of local citizens has produced an increase in property. An essential characteristic of regional self-government is also legal status and...labor process. This could be called the personalization of management. Essentially , this means that man in the labor process is increasingly...underground Polish Scouts of World War II] (which did, after all, differ in something essential from "Polish Scouting"), I have a definite opinion on this

Ultrasonic Polishing

NASA Technical Reports Server (NTRS)

Gilmore, Randy

1993-01-01

The ultrasonic polishing process makes use of the high-frequency (ultrasonic) vibrations of an abradable tool which automatically conforms to the work piece and an abrasive slurry to finish surfaces and edges on complex, highly detailed, close tolerance cavities in materials from beryllium copper to carbide. Applications range from critical deburring of guidance system components to removing EDM recast layers from aircraft engine components to polishing molds for forming carbide cutting tool inserts or injection molding plastics. A variety of materials including tool steels, carbides, and even ceramics can be successfully processed. Since the abradable tool automatically conforms to the work piece geometry, the ultrasonic finishing method described offers a number of important benefits in finishing components with complex geometries.

Tooth polishing: The current status

PubMed Central

Sawai, Madhuri Alankar; Bhardwaj, Ashu; Jafri, Zeba; Sultan, Nishat; Daing, Anika

2015-01-01

Healthy teeth and gums make a person feel confident and fit. As people go about their daily routines and with different eating and drinking habits, the tooth enamel turns yellowish or gets stained. Polishing traditionally has been associated with the prophylaxis procedure in most dental practices, which patients know and expect. However, with overzealous use of polishing procedure, there is wearing of the superficial tooth structure. This would lead to more accumulation of local deposits. Also, it takes a long time for the formation of the fluoride-rich layer of the tooth again. Hence, now-a-days, polishing is not advised as a part of routine oral prophylaxis procedure but is done selectively based on the patients’ need. The article here, gives an insight on the different aspects of the polishing process along with the different methods and agents used for the same. PMID:26392683

Electro-rheological finishing for optical surfaces

NASA Astrophysics Data System (ADS)

Cheng, Haobo; Wang, Peng

2009-05-01

Many polishing techniques such as fixed-abrasive polishing, abrasive-free polishing and magnetorheological finishing etc., have been developed. Meanwhile, a new technique is proposed using the mixture of the electro-rheological (Er) fluid with abrasives as polishing slurry, which is a special process does not require pad. Electrorheological fluid is a special suspension liquid, whose viscosity has an approximate proportional relation with the electric strength applied. When the field strength reaches a certain limit, the phase transition occurs and the liquid acquires a solid like character, and while the electric field is removed, the fluid regains its original viscosity during the order of milliseconds. In this research work, we employed the characteristics of viscosity change of Er fluid to hold the polishing particles for micromachining. A point-contact electro-rheological finishing (Erf) tool was designed with a tip diameter 0.5~1mm. Both the anode and the cathode of the electric field were combined in the tool. The electric field could be controllable. When the tool moves across the profile of the work piece, by controlling the electric field strength as well as the other manufacturing parameters we can assure the deterministic material removal. Furthermore, the electro-rheological finishing process has been planned in detailed.

Enhancement of surface damage resistance by selective chemical removal of CeO2

NASA Astrophysics Data System (ADS)

Kamimura, Tomosumi; Motokoshi, Shinji; Sakamoto, Takayasu; Jitsuno, Takahisa; Shiba, Haruya; Akamatsu, Shigenori; Horibe, Hideo; Okamoto, Takayuki; Yoshida, Kunio

2005-02-01

The laser-induced damage threshold of polished fused silica surfaces is much lower than the damage threshod of its bulk. It is well known that contaminations of polished surface are one of the causes of low threshold of laser-induced surface damage. Particularly, polishing contamination such as cerium dioxide (CeO2) compound used in optical polishing process is embedded inside the surface layer, and cannot be removed by conventional cleaning. For the enhancement of surface damage resistance, various surface treatments have been applied to the removal of embedded polishing compound. In this paper, we propose a new method using slective chemical removal with high-temperature sulfuric acid (H2SO4). Sulfuric acid could dissolve only CeO2 from the fused silica surface. The surface roughness of fused silica treated H2SO4 was kept through the treatment process. At the wavelength of 355 nm, the surface damage threshold was drastically improved to the nearly same as bulk quality. However, the effect of our treatment was not observed at the wavelength of 1064 nm. The comparison with our previous results obtained from other surface treatments will be discussed.

Effects of salt-related mode conversions on subsalt prospecting

DOE Office of Scientific and Technical Information (OSTI.GOV)

Ogilvie, J.S.; Purnell, G.W.

1996-03-01

Mode conversion of waves during seismic reflection surveys has generally been considered a small phenomenon that could be neglected in data processing and interpretation. However, in subsalt prospecting, the contrast in material properties at the salt/sediment interface is often great enough that significant P-to-S and/or S-to-P conversion occurs. The resulting converted waves can be both a help and a hindrance for subsalt prospecting. A case history from the Mississippi Canyon area of the Gulf of Mexico demonstrates strong converted-wave reflections from the base-of-salt that complicate the evaluation of a subsalt prospect using 3-D seismic data. Before and after stack, themore » converted-wave reflections are evident in 2-D and 3-D surveys across the prospect. Ray-tracing synthetic common midpoint (CMP) gathers provides some useful insights about the occurrence of these waves, but elastic-wave-equation modeling is even more useful. While the latter is more time-consuming, even in 2-D, it also provides a more realistic simulated seismic survey across the prospect, which helps to reveal how some converted waves survive the processes of CMP stack and migration, and thereby present possible pitfalls to an unwary interpreter. The insights gained from the synthetic-data suggest some simple techniques that can assist an interpreter in the 3-D interpretation of subsalt events.« less

GPR data processing computer software for the PC

USGS Publications Warehouse

Lucius, Jeffrey E.; Powers, Michael H.

2002-01-01

The computer software described in this report is designed for processing ground penetrating radar (GPR) data on Intel-compatible personal computers running the MS-DOS operating system or MS Windows 3.x/95/98/ME/2000. The earliest versions of these programs were written starting in 1990. At that time, commercially available GPR software did not meet the processing and display requirements of the USGS. Over the years, the programs were refined and new features and programs were added. The collection of computer programs presented here can perform all basic processing of GPR data, including velocity analysis and generation of CMP stacked sections and data volumes, as well as create publication quality data images.

Fabrication of an optical component

DOEpatents

Nichols, Michael A.; Aikens, David M.; Camp, David W.; Thomas, Ian M.; Kiikka, Craig; Sheehan, Lynn M.; Kozlowski, Mark R.

2000-01-01

A method for forming optical parts used in laser optical systems such as high energy lasers, high average power lasers, semiconductor capital equipment and medical devices. The optical parts will not damage during the operation of high power lasers in the ultra-violet light range. A blank is first ground using a fixed abrasive grinding method to remove the subsurface damage formed during the fabrication of the blank. The next step grinds and polishes the edges and forms bevels to reduce the amount of fused-glass contaminants in the subsequent steps. A loose abrasive grind removes the subsurface damage formed during the fixed abrasive or "blanchard" removal process. After repolishing the bevels and performing an optional fluoride etch, the surface of the blank is polished using a zirconia slurry. Any subsurface damage formed during the loose abrasive grind will be removed during this zirconia polish. A post polish etch may be performed to remove any redeposited contaminants. Another method uses a ceria polishing step to remove the subsurface damage formed during the loose abrasive grind. However, any residual ceria may interfere with the optical properties of the finished part. Therefore, the ceria and other contaminants are removed by performing either a zirconia polish after the ceria polish or a post ceria polish etch.

Cleansing orthodontic brackets with air-powder polishing: effects on frictional force and degree of debris.

PubMed

Leite, Brisa Dos Santos; Fagundes, Nathalia Carolina Fernandes; Aragón, Mônica Lídia Castro; Dias, Carmen Gilda Barroso Tavares; Normando, David

2016-01-01

Debris buildup on the bracket-wire interface can influence friction. Cleansing brackets with air-powder polishing can affect this process. The aim of this study was to evaluate the frictional force and amount of debris remaining on orthodontic brackets subjected to prophylaxis with air-powder polishing. Frictional force and debris buildup on the surface of 28 premolar brackets were evaluated after orthodontic treatment. In one hemiarch, each bracket was subjected to air-powder polishing (n = 14) for five seconds, while the contralateral hemiarch (n = 14) served as control. Mechanical friction tests were performed and images of the polished bracket surfaces and control surfaces were examined. Wilcoxon test was applied for comparative analysis between hemiarches at p < 0.05. Brackets that had been cleaned with air-powder polishing showed lower friction (median = 1.27 N) when compared to the control surfaces (median = 4.52 N) (p < 0.01). Image analysis showed that the control group exhibited greater debris buildup (median = 2.0) compared with the group that received prophylaxis with air-powder polishing (median = 0.5) (p < 0.05). Cleansing orthodontic brackets with air-powder polishing significantly reduces debris buildup on the bracket surface while decreasing friction levels observed during sliding mechanics.

Development of TIF based figuring algorithm for deterministic pitch tool polishing

NASA Astrophysics Data System (ADS)

Yi, Hyun-Su; Kim, Sug-Whan; Yang, Ho-Soon; Lee, Yun-Woo

2007-12-01

Pitch is perhaps the oldest material used for optical polishing, leaving superior surface texture, and has been used widely in the optics shop floor. However, for its unpredictable controllability of removal characteristics, the pitch tool polishing has been rarely analysed quantitatively and many optics shops rely heavily on optician's "feel" even today. In order to bring a degree of process controllability to the pitch tool polishing, we added motorized tool motions to the conventional Draper type polishing machine and modelled the tool path in the absolute machine coordinate. We then produced a number of Tool Influence Function (TIF) both from an analytical model and a series of experimental polishing runs using the pitch tool. The theoretical TIFs agreed well with the experimental TIFs to the profile accuracy of 79 % in terms of its shape. The surface figuring algorithm was then developed in-house utilizing both theoretical and experimental TIFs. We are currently undertaking a series of trial figuring experiments to prove the performance of the polishing algorithm, and the early results indicate that the highly deterministic material removal control with the pitch tool can be achieved to a certain level of form error. The machine renovation, TIF theory and experimental confirmation, figuring simulation results are reported together with implications to deterministic polishing.

Novel bio-synthetic hybrid materials and coculture systems for musculoskeletal tissue engineering

NASA Astrophysics Data System (ADS)

Lee, Hyeseung Janice

Tissue Engineering is a truly exciting field of this age, trying to regenerate and repair impaired tissues. Unlike the old artificial implants, tissue engineering aims at making a long-term functional biological replacement. One strategy for such tissue engineering requires the following three components: cells, scaffolds, and soluble factors. Cells are cultured in a three-dimensional (3D) scaffold with medium containing various soluble factors. Once a tissue is developed in vitro, then it is implanted in vivo. The overall goal of this thesis was to develop novel bio-synthetic hybrid scaffolds and coculture system for musculoskeletal tissue engineering. The most abundant cartilage extracellular matrix (ECM) components are collagen and glycosaminoglycan (GAG), which are the natural scaffold for chondrocytes. As two different peptides, collagen mimetic peptide (CMP) and hyaluronic acid binding peptide (HABPep) were previously shown to bind to collagen and hyaluronic acid (HA) of GAG, respectively, it was hypothesized that immobilizing CMP and HABP on 3D scaffold would results in an interaction between ECM components and synthetic scaffolds via peptide-ECM bindings. CMP or HABPep-conjugated photopolymerizable poly(ethylene oxide) diacrylate (PEODA) hydrogels were synthesized and shown to retain encapsulated collagen or HA, respectively. This result supported that conjugated CMP and HABPep can interact with collagen and HA, respectively, and can serve as biological linkers in 3D synthetic hydrogels. When chondrocytes or mesenchymal stem cells (MSCs) were seeded, cells in CMP-conjugated scaffolds produced significantly more amount of type II collagen and GAG, compared to those in control scaffolds. Moreover, MSCs cultured in CMP-conjugated scaffolds exhibited lower level of hypertrophic markers, cbfa-1 and type X collagen. These results demonstrated that enhanced interaction between collagen and scaffold via CMP improves chondrogenesis of chondrocytes and MSCs and further reduces hypertrophy of differentiating MSCs. On the other hand, although cells in HABPep-conjugated scaffolds produced less ECM components, they survived and proliferated significantly more than those in control, resulting in overall increase in ECM contents per scaffold. Once implanted in vivo, HABPep-conjugated constructs increased GAG and type II collagen contents further, compared to those of the control hydrogel. These results showed that enhanced interaction between HA and scaffold via HABPep improved the in vitro culture expansion of MSCs and further ECM production in vivo. Effects of cell-secreted bioactive factors via cell-cell communication on stem cell differentiation were also investigated in 3D bilayer system. First, when mesenchymal progenitor cells (MPCs) were cocultured with ES-derived cells (ESDC), morphogenetic factors secreted by ESDCs showed a potential to improve MPC chondrogenesis in both control and chondrogenic medium by increasing not only MPC's chondrogenic gene expression, but also ECM production. Moreover, the effect of ESDC cell-mediated chondrogenesis of MSC could not be mimicked by chondrogenic medium supplemented with TGF-beta1 and dexamethasone. Secondly, coculturing hepatic cells enhanced specific chondrogenic differentiation of ES cells in the 3D bilayer system. These studies demonstrated that cell-secreted soluble factors can be used to guide stem cell differentiation.

Form control in atmospheric pressure plasma processing of ground fused silica

NASA Astrophysics Data System (ADS)

Li, Duo; Wang, Bo; Xin, Qiang; Jin, Huiliang; Wang, Jun; Dong, Wenxia

2014-08-01

Atmospheric Pressure Plasma Processing (APPP) using inductively coupled plasma has demonstrated that it can achieve comparable removal rate on the optical surface of fused silica under the atmosphere pressure and has the advantage of inducing no sub-surface damage for its non-contact and chemical etching mechanism. APPP technology is a cost effective way, compared with traditional mechanical polishing, magnetorheological finishing and ion beam figuring. Thus, due to these advantages, this technology is being tested to fabricate large aperture optics of fused silica to help shorten the polishing time in optics fabrication chain. Now our group proposes to use inductively coupled plasma processing technology to fabricate ground surface of fused silica directly after the grinding stage. In this paper, form control method and several processing parameters are investigated to evaluate the removal efficiency and the surface quality, including the robustness of removal function, velocity control mode and tool path strategy. However, because of the high heat flux of inductively coupled plasma, the removal depth with time can be non-linear and the ground surface evolvement will be affected. The heat polishing phenomenon is founded. The value of surface roughness is reduced greatly, which is very helpful to reduce the time of follow-up mechanical polishing. Finally, conformal and deterministic polishing experiments are analyzed and discussed. The form error is less 3%, before and after the APPP, when 10μm depth of uniform removal is achieved on a 60×60mm ground fused silica. Also, a basin feature is fabricated to demonstrate the figuring capability and stability. Thus, APPP is a promising technology in processing the large aperture optics.

Spin dynamics in the modulation frame: application to homonuclear recoupling in magic angle spinning solid-state NMR.

PubMed

De Paëpe, Gaël; Lewandowski, Józef R; Griffin, Robert G

2008-03-28

We introduce a family of solid-state NMR pulse sequences that generalizes the concept of second averaging in the modulation frame and therefore provides a new approach to perform magic angle spinning dipolar recoupling experiments. Here, we focus on two particular recoupling mechanisms-cosine modulated rotary resonance (CMpRR) and cosine modulated recoupling with isotropic chemical shift reintroduction (COMICS). The first technique, CMpRR, is based on a cosine modulation of the rf phase and yields broadband double-quantum (DQ) (13)C recoupling using >70 kHz omega(1,C)/2pi rf field for the spinning frequency omega(r)/2=10-30 kHz and (1)H Larmor frequency omega(0,H)/2pi up to 900 MHz. Importantly, for p>or=5, CMpRR recouples efficiently in the absence of (1)H decoupling. Extension to lower p values (3.5

Magnetorheological finishing for removing surface and subsurface defects of fused silica optics

NASA Astrophysics Data System (ADS)

Catrin, Rodolphe; Neauport, Jerome; Taroux, Daniel; Cormont, Philippe; Maunier, Cedric; Lambert, Sebastien

2014-09-01

We investigate the capacity of magnetorheological finishing (MRF) process to remove surface and subsurface defects of fused silica optics. Polished samples with engineered surface and subsurface defects were manufactured and characterized. Uniform material removals were performed with a QED Q22-XE machine using different MRF process parameters in order to remove these defects. We provide evidence that whatever the MRF process parameters are, MRF is able to remove surface and subsurface defects. Moreover, we show that MRF induces a pollution of the glass interface similar to conventional polishing processes.

Laser polishing for topography management of accelerator cavity surfaces

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zhao, Liang; Klopf, J. Mike; Reece, Charles E.

2015-07-20

Improved energy efficiency and reduced cost are greatly desired for advanced particle accelerators. Progress toward both can be made by atomically-smoothing the interior surface of the niobium superconducting radiofrequency accelerator cavities at the machine's heart. Laser polishing offers a green alternative to the present aggressive chemical processes. We found parameters suitable for polishing niobium in all surface states expected for cavity production. As a result, careful measurement of the resulting surface chemistry revealed a modest thinning of the surface oxide layer, but no contamination.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Gustafsson, Helena; Runesson, Johan; Lundqvist, Jessica

The objective of the EU-funded integrated project ACuteTox is to develop a strategy in which general cytotoxicity, together with organ-specific toxicity and biokinetic features, are used for the estimation of human acute systemic toxicity. Our role in the project is to characterise the effect of reference chemicals with regard to neurotoxicity. We studied cell membrane potential (CMP), noradrenalin (NA) uptake, acetylcholine esterase (AChE) activity, acetylcholine receptor (AChR) signalling and voltage-operated calcium channel (VOCC) function in human neuroblastoma SH-SY5Y cells after exposure to 23 pharmaceuticals, pesticides or industrial chemicals. Neurotoxic alert chemicals were identified by comparing the obtained data with cytotoxicitymore » data from the neutral red uptake assay in 3T3 mouse fibroblasts. Furthermore, neurotoxic concentrations were correlated with estimated human lethal blood concentrations (LC50). The CMP assay was the most sensitive assay, identifying eight chemicals as neurotoxic alerts and improving the LC50 correlation for nicotine, lindane, atropine and methadone. The NA uptake assay identified five neurotoxic alert chemicals and improved the LC50 correlation for atropine, diazepam, verapamil and methadone. The AChE, AChR and VOCC assays showed limited potential for detection of acute toxicity. The CMP assay was further evaluated by testing 36 additional reference chemicals. Five neurotoxic alert chemicals were generated and orphendrine and amitriptyline showed improved LC50 correlation. Due to the high sensitivity and the simplicity of the test protocol, the CMP assay constitutes a good candidate assay to be included in an in vitro test strategy for prediction of acute systemic toxicity.« less

High accuracy differential pressure measurements using fluid-filled catheters - A feasibility study in compliant tubes.

PubMed

Rotman, Oren Moshe; Weiss, Dar; Zaretsky, Uri; Shitzer, Avraham; Einav, Shmuel

2015-09-18

High accuracy differential pressure measurements are required in various biomedical and medical applications, such as in fluid-dynamic test systems, or in the cath-lab. Differential pressure measurements using fluid-filled catheters are relatively inexpensive, yet may be subjected to common mode pressure errors (CMP), which can significantly reduce the measurement accuracy. Recently, a novel correction method for high accuracy differential pressure measurements was presented, and was shown to effectively remove CMP distortions from measurements acquired in rigid tubes. The purpose of the present study was to test the feasibility of this correction method inside compliant tubes, which effectively simulate arteries. Two tubes with varying compliance were tested under dynamic flow and pressure conditions to cover the physiological range of radial distensibility in coronary arteries. A third, compliant model, with a 70% stenosis severity was additionally tested. Differential pressure measurements were acquired over a 3 cm tube length using a fluid-filled double-lumen catheter, and were corrected using the proposed CMP correction method. Validation of the corrected differential pressure signals was performed by comparison to differential pressure recordings taken via a direct connection to the compliant tubes, and by comparison to predicted differential pressure readings of matching fluid-structure interaction (FSI) computational simulations. The results show excellent agreement between the experimentally acquired and computationally determined differential pressure signals. This validates the application of the CMP correction method in compliant tubes of the physiological range for up to intermediate size stenosis severity of 70%. Copyright © 2015 Elsevier Ltd. All rights reserved.

The relationship of insulin resistance estimated by triglyceride glucose index and coronary plaque characteristics.

PubMed

Won, Ki-Bum; Kim, Yun Seok; Lee, Byoung Kwon; Heo, Ran; Han, Donghee; Lee, Ji Hyun; Lee, Sang-Eun; Sung, Ji Min; Cho, Iksung; Park, Hyung-Bok; Cho, In-Jeong; Chang, Hyuk-Jae

2018-05-01

The triglyceride glucose (TyG) index is a useful surrogate marker for insulin resistance, which is an important risk factor for coronary artery disease (CAD). However, data on the relationship of the TyG index and coronary plaque characteristics are limited.This study included 2840 participants with near-normal renal function who underwent coronary computed tomography angiography. CAD was defined as the presence of any plaques, and obstructive CAD was defined as the presence of plaques with ≥50% stenosis. The relationship between the TyG index and noncalcified plaque (NCP), calcified or mixed plaque (CMP), and coronary artery calcium score (CACS) was evaluated.All participants were stratified into 4 groups based on the quartiles of the TyG index. The prevalence of CAD and obstructive CAD significantly increased with increasing quartiles. The risk for NCP and obstructive NCP was not different among all groups. However, compared with group I (lowest quartile), the risk for CMP was higher in groups III (odds ratio [OR]: 1.438) and IV (highest quartile) (OR: 1.895) (P < .05), and that for obstructive CMP was higher in groups II (OR: 1.469), III (OR: 1.595), and IV (OR: 2.168) (P < .05). Multivariate regression analysis showed that the TyG index was associated with an increased risk for CAD (OR: 1.700), obstructive CAD (OR: 1.692), and CACS >400 (OR: 1.448) (P < .05).The TyG index was independently associated with the presence and severity of CAD due to an increased risk for CMP.

Continuous counter-current chromatography for capture and polishing steps in biopharmaceutical production.

PubMed

Steinebach, Fabian; Müller-Späth, Thomas; Morbidelli, Massimo

2016-09-01

The economic advantages of continuous processing of biopharmaceuticals, which include smaller equipment and faster, efficient processes, have increased interest in this technology over the past decade. Continuous processes can also improve quality assurance and enable greater controllability, consistent with the quality initiatives of the FDA. Here, we discuss different continuous multi-column chromatography processes. Differences in the capture and polishing steps result in two different types of continuous processes that employ counter-current column movement. Continuous-capture processes are associated with increased productivity per cycle and decreased buffer consumption, whereas the typical purity-yield trade-off of classical batch chromatography can be surmounted by continuous processes for polishing applications. In the context of continuous manufacturing, different but complementary chromatographic columns or devices are typically combined to improve overall process performance and avoid unnecessary product storage. In the following, these various processes, their performances compared with batch processing and resulting product quality are discussed based on a review of the literature. Based on various examples of applications, primarily monoclonal antibody production processes, conclusions are drawn about the future of these continuous-manufacturing technologies. Copyright © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Rapid fabrication of a silicon modification layer on silicon carbide substrate.

PubMed

Bai, Yang; Li, Longxiang; Xue, Donglin; Zhang, Xuejun

2016-08-01

We develop a kind of magnetorheological (MR) polishing fluid for the fabrication of a silicon modification layer on a silicon carbide substrate based on chemical theory and actual polishing requirements. The effect of abrasive concentration in MR polishing fluid on material removal rate and removal function shape is investigated. We conclude that material removal rate will increase and tends to peak value as the abrasive concentration increases to 0.3 vol. %, and the removal function profile will become steep, which is a disadvantage to surface frequency error removal at the same time. The removal function stability is also studied and the results show that the prepared MR polishing fluid can satisfy actual fabrication requirements. An aspheric reflective mirror of silicon carbide modified by silicon is well polished by combining magnetorheological finishing (MRF) using two types of MR polishing fluid and computer controlled optical surfacing (CCOS) processes. The surface accuracy root mean square (RMS) is improved from 0.087λ(λ=632.8  nm) initially to 0.020λ(λ=632.8  nm) in 5.5 h total and the tool marks resulting from MRF are negligible. The PSD analysis results also shows that the final surface is uniformly polished.

Properties of perpendicular-anisotropy magnetic tunnel junctions fabricated over the bottom electrode contact

NASA Astrophysics Data System (ADS)

Miura, Sadahiko; Honjo, Hiroaki; Kinoshita, Keizo; Tokutome, Keiichi; Koike, Hiroaki; Ikeda, Shoji; Endoh, Tetsuo; Ohno, Hideo

2015-04-01

Perpendicular-anisotropy magnetic tunnel junctions (MTJs) were prepared on four substrate geometries, i.e., directly on the axis of the bottom electrode contact, directly off the axis of the bottom electrode contact, on the axis of the bottom electrode contact with a polished bottom electrode, and off the axis of the bottom electrode contact with a polished bottom electrode. Electrical shorts were observed for direct on-axis geometry at a certain extent, whereas there were no electrical shorts for the other three geometries. The MR ratio/σR, JC0, and thermal stability factor of the devices for polish on-axis geometry were almost the same as those for polish off-axis geometry. From TEM observations of the polish on-axis device, the interface between the bottom contact and the base electrode was determined to be rough, whereas the MgO barrier layer was determined to be smooth, indicating that the polish process was effective for smooth magnetic tunnel junction fabrication over the bottom contact. MTJs for polish on-axis geometry eliminated the base electrode resistance and increased the magnetoresistance ratio. This technology contributes to the higher density of spin transfer torque magnetic random access memory.

Forces acting between polishing tool and workpiece surface in magnetorheological finishing

NASA Astrophysics Data System (ADS)

Schinhaerl, Markus; Vogt, Christian; Geiss, Andreas; Stamp, Richard; Sperber, Peter; Smith, Lyndon; Smith, Gordon; Rascher, Rolf

2008-08-01

Magnetorheological finishing is a computer-controlled polishing technique that is used mainly in the field of high-quality optical lens production. The process is based on the use of a magnetorheological polishing fluid that is able, in a reversible manner, to change its viscosity from a liquid state to a solid state under the control of a magnetic field. This outstanding characteristic facilitates rapid control (in milliseconds) of the yield stress, and thus the pressure applied to the workpiece surface to be polished. A three-axis dynamometer was used to measure the forces acting between the magnetorheological fluid and the workpiece surface during determination of the material removal characteristic of the polishing tool (influence function). The results of a testing series using a QED Q22-X MRF polishing machine with a 50 mm wheel assembly show that the normal forces range from about 2 to 20 N. Knowledge of the forces is essential, especially when thin workpieces are to be polished and distortion becomes significant. This paper discusses, and gives examples of, the variation in the parameters experienced during a programme of experiments, and provides examples of the value of this work.

Way to nanogrinding technology

NASA Astrophysics Data System (ADS)

Miyashita, Masakazu

1990-11-01

Precision finishing process of hard and brittle material components such as single crystal silicon wafer and magnetic head consists of lapping and polishing which depend too much on skilled labor. This process is based on the traditional optical production technology and entirely different from the automated mass production technique in automobile production. Instead of traditional lapping and polishing, the nanogrinding is proposed as a new stock removal machining to generate optical surface on brittle materials. By this new technology, the damage free surface which is the same one produced by lapping and polishing can be obtained on brittle materials, and the free carvature can also be generated on brittle materials. This technology is based on the motion copying principle which is the same as in case of metal parts machining. The new nanogrinding technology is anticipated to be adapted as the machining technique suitable for automated mass production, because the stable machining on the level of optical production technique is expected to be obtained by the traditional lapping and polishing.

The Gradual Transformation of the Polish Public Science System

PubMed Central

Heinecke, Steffi

2016-01-01

This paper investigates institutional change in the Polish public science system (PPSS) in the past twenty years. Employing macro-statistical data, the paper argues that this change process has unfolded stepwise and relatively late despite major political and economic transformations in post-socialist Poland. Using a historical-institutionalist perspective, the paper focuses on processes of institutional change, including layering, displacement, and dismantling. One major finding is that the speed and depth of the gradual transformation differs considerably between the three research performing sectors of the Polish public science system. As the Polish Academy of Sciences was reproduced institutionally, the former governmental units for applied R&D were partly dismantled and displaced by private sector R&D units. In contrast, the Higher Education sector underwent a strong expansion and, thus, layering of new research activities and fields. Since policy shifts within the PPSS occurred relatively late, the more than two decades following the collapse of communism are of special interest to scholars of incremental, yet cumulative, institutional change. PMID:27077386

Diffusion welding. [heat treatment of nickel alloys following single step vacuum welding process

NASA Technical Reports Server (NTRS)

Holko, K. H. (Inventor)

1974-01-01

Dispersion-strengthened nickel alloys are sanded on one side and chemically polished. This is followed by a single-step welding process wherein the polished surfaces are forced into intimate contact at 1,400 F for one hour in a vacuum. Diffusion, recrystallization, and grain growth across the original weld interface are obtained during postheating at 2,150 F for two hours in hydrogen.

Metal Ion-Assembled Micro-Collagen Heterotrimers

PubMed Central

LeBruin, Lyndelle Toni; Banerjee, Sunandan; O'Rourke, Bruce Delany; Case, Martin Ashley

2011-01-01

Collagen mimetic peptides (CMPs) provide critical insight into the assembly, stability and structure of the triple helical collagen protein. The majority of natural fibrous collagens are aab or abc heterotrimers, yet few examples of heterotrimeric CMPs have been reported. Previously CMP heterotrimers have only been accessible by total syntheses or by introducing complementary interstrand electrostatic or steric interactions. Here we describe an abc CMP heterotrimer in which each contributing CMP consists of only three amino acids: glycine, proline and 4-hydroxyproline. Assembly of the heterotrimeric triple helix is directed by a combination of metal-ion coordination to set the relative register of the CMPs, and minimization of valence frustration to direct heterotrimerization. Assembly of the four-component mixture is facile and extremely rapid, and equilibration to the abc heterotrimer occurs within a few hours at modestly elevated temperatures. The melting temperatures of the metal-assembled collagen trimers are higher by some 30 °C than the apopeptide assemblies. Two iterations of the design are described, and the outcomes suggest possibilities for designing self-assembling abc and abb heterotrimers. PMID:21590759

Interaction of Tl +3 with mononucleotides: metal ion binding and sugar conformation

NASA Astrophysics Data System (ADS)

Nafisi, Sh.; Mohajerani, N.; Hadjiakhoondi, A.; Monajemi, M.; Garib, F.

2001-05-01

The interaction of Tl 3+ with sodium salts of adenosine-5'-monophosphate (5'-AMP), guanosine-5'-monophosphate (5'-GMP), cytidine-5'-monophosphate (5'-CMP), thymidine 5'-monophosphate (5'-dTMP) in ratios 1 and 2 have been studied in neutral pH. The solid complexes were isolated and characterized by Fourier transform infrared (FTIR) and 1H NMR spectroscopy. In the Tl 2(AMP) 3, Tl 3+ binds directly to N-7 and indirectly to the N-1 position of the pyrimidine ring and phosphate group with sugar moiety in C2'-endoanti. The crystalline salt of Tl 2(GMP) 3 show direct Tl-N-7 and Tl-PO 3(inner-sphere) binding. The conformation of ribose moiety in Tl 2(GMP) 3 is C3'-endoanti. In the Tl 2(CMP) 3, Tl 3+ bind directly to N-3 and PO32- (inner-sphere). The conformation of ribose moiety in Tl 2(CMP) 3 is C2'-endoanti. In the Tl 2(dTMP) 3, Tl 3+ bind indirectly to carbonyl group. The sugar moiety in Tl 2(dTMP) 3 is C3'-endoanti.

Identification of a novel ovine PrP polymorphism and scrapie-resistant genotypes for St. Croix White and a related composite breed.

PubMed

Seabury, C M; Derr, J N

2003-01-01

Susceptibility to scrapie is primarily controlled by polymorphisms in the ovine prion protein gene (PRNP). Here, we report a novel ovine exon three PRNP polymorphism (SNP G346C; P116), its association with the ovine ARQ allele (P116A136R154Q171), and two new genotypes (PARQ/ARR; PARQ/ARQ) for the St. Croix White (SCW) breed and a related composite (CMP) breed developed for meat production. The (P116) polymorphism occurs between the N-terminal cleavage site and the hydrophobic region of the ovine prion protein, a region which exhibits extreme conservation across mammalian taxa. The relatively high frequency (0.75) of resistant ARR alleles and the absence of ARQ alleles for the SCW ewes used as breeding stock for CMP resulted in significant genic differentiation (P = 0.0123; S.E. = 0.00113). Additionally, the majority of the SCW (66.7%) and CMP (65.4%) sampled possessed genotypes considered resistant or nearly resistant to scrapie and experimental BSE (bovine spongiform encephalopathy. Copyright 2003 S. Karger AG, Basel

DOE Office of Scientific and Technical Information (OSTI.GOV)

Takeshita, Kenji

A mathematical model to predict the extraction behavior of metal ion between a polymer gel and an aqueous solution was proposed. It consists of the Flory-Huggins formula for evaluating thermodynamically the physico-chemical properties of polymer gel, the modified Stokes-Einstein equation to evaluate the mass transfer rate of metal ion into polymer gel and the equation to evaluate the extraction equilibrium. The extraction of lanthanide elements, Nd(III), Sm(III) and Gd(III), from an aqueous solution containing nitrate ion was carried out by the use of SDB (styrene-divinylbenzene copolymer) gel swollen with a bidentate organophosphorus compound, CMP (dihexyl-N,N-diethylcarbamoylmethylpohosphonate). The binary extraction and themore » effect of the crosslinking degree of SDB gel on the extraction rate were examined. These experimental results were in agreement with the predictions calculated by the proposed model. It was confirmed that the extraction behavior of lanthanide ions into the SDB gel was predicted accurately, when the physico-chemical properties of SDB gel, such as the affinity between SDB and CMP ({chi}) and the crosslinking degree ({nu}{sub e}), and a coefficient defined in the modified Stokes-Einstein equation (K{sub 0}) were known. This model is available as a tool to design an extraction chromatographic process using polymer gel.« less

Effect of carrageenan addition on the rennet-induced gelation of skim milk.

PubMed

Wang, Fang; Zhang, Wei; Ren, Fazheng

2016-09-01

Carrageenan (CG) (κ-CG, ι-CG and λ-CG) was added to skim milk and the rennet-induced aggregation was studied. Caseinomacropeptide (CMP) release, diffusing wave spectroscopy (DWS) and rheology were used to follow the structural dynamics of casein micelles during gelation. The influence of carrageenan on the nature of protein interactions in the gels was investigated using a combination of ultracentrifugation and specific dissociating agents. For the recombined samples containing κ-CG and low concentrations of ι-CG and λ-CG, the CMP release was slowed down; however, the development of DWS and rheological parameters was similar to that of the control sample, and the increase in the incorporation of proteins through calcium bridges and hydrophobic interactions may be the most likely contributors. For the recombined samples containing high concentrations of ι-CG and λ-CG, other factors may impede the gel formation process. High concentrations of ι-CG and λ-CG strongly interfered with the rennet-induced aggregation, interrupted the interaction of caseins and therefore may contribute to good quality of low-fat cheese. © 2016 Society of Chemical Industry. © 2016 Society of Chemical Industry.

A novel vibration assisted polishing device based on the flexural mechanism driven by the piezoelectric actuators

NASA Astrophysics Data System (ADS)

Wang, Guilian; Zhou, Xiaoqin; Ma, Peiqun; Wang, Rongqi; Meng, Guangwei; Yang, Xu

2018-01-01

The vibration assisted polishing has widely application fields because of higher machining frequency and better polishing quality, especially the polishing with the non-resonant mode that is regarded as a kind of promising polishing method. This paper reports a novel vibration assisted polishing device, consisting of the flexible hinge mechanism driven by the piezoelectric actuators, which is suitable for polishing planes or curve surfaces with slow curvature. Firstly, the generation methods of vibration trajectory are investigated for the same frequency and different frequency signals' inputs, respectively, and then the types of elliptic and Lissajous's vibration trajectories are generated respectively. Secondly, a flexural mechanism consisting of the right circular flexible hinges and the leaf springs is developed to produce two-dimensional vibration trajectory. Statics and dynamics investigating of this flexible mechanism are finished in detail. The analytical models about input and output compliances of the flexural mechanism are established according to the matrix-based compliance modeling, and the dynamic model of the flexural mechanism based on the Euler-Lagrange equation is also presented. The finite element model of the flexural mechanism was established to carry out the numerical simulation in order to testify the rationality of device design. Finally, the polishing experiment is carried out to prove the effectiveness of the vibration device. The experimental results show that this novel vibration assisted polishing device developed in this study can remove more effectively the cutting marks left by last process and obviously reduce the workpiece surface roughness.

Research on high-efficiency polishing technology of photomask substrate

NASA Astrophysics Data System (ADS)

Zhao, Shijie; Xie, Ruiqing; Zhou, Lian; Liao, Defeng; Chen, Xianhua; Wang, Jian

2018-03-01

A method of photomask substrate fabrication is demonstrated ,that the surface figure and roughness of fused silica will converge to target precision rapidly with the full aperture polishing. Surface figure of optical flats in full aperture polishing processes is primarily dependent on the surface profile of polishing pad, therefor, a improved function of polishing mechanism was put forward based on two axis lapping machine and technology experience, and the pad testing based on displacement sensor and the active conditioning method of the pad is applied in this research. Moreover , the clamping deformation of the thin glass is solved by the new pitch dispensing method. The experimental results show that the surface figure of the 152mm×152mm×6.35mm optical glass is 0.25λ(λ=633nm) and the roughness is 0.32nm ,which has meet the requirements of mask substrate for 90 45nm nodes.

The Electronic CardioMetabolic Program (eCMP) for Patients With Cardiometabolic Risk: A Randomized Controlled Trial

PubMed Central

Koliwad, Suneil; Poon, Tak; Xiao, Lan; Lv, Nan; Griggs, Robert; Ma, Jun

2016-01-01

Background Effective lifestyle interventions targeting high-risk adults that are both practical for use in ambulatory care settings and scalable at a population management level are needed. Objective Our aim was to examine the potential effectiveness, feasibility, and acceptability of delivering an evidence-based Electronic Cardio-Metabolic Program (eCMP) for improving health-related quality of life, improving health behaviors, and reducing cardiometabolic risk factors in ambulatory care high-risk adults. Methods We conducted a randomized, wait-list controlled trial with 74 adults aged ≥18 years recruited from a large multispecialty health care organization. Inclusion criteria were (1) BMI ≥35 kg/m2 and prediabetes, previous gestational diabetes and/or metabolic syndrome, or (2) BMI ≥30 kg/m2 and type 2 diabetes and/or cardiovascular disease. Participants had a mean age of 59.7 years (SD 11.2), BMI 37.1 kg/m2 (SD 5.4) and were 59.5% female, 82.4% white. Participants were randomized to participate in eCMP immediately (n=37) or 3 months later (n=37). eCMP is a 6-month program utilizing video conferencing, online tools, and pre-recorded didactic videos to deliver evidence-based curricula. Blinded outcome assessments were conducted at 3 and 6 months postbaseline. Data were collected and analyzed between 2014 and 2015. The primary outcome was health-related quality of life. Secondary outcomes included biometric cardiometabolic risk factors (eg, body weight), self-reported diet and physical activity, mental health status, retention, session attendance, and participant satisfaction. Results Change in quality of life was not significant in both immediate and delayed participants. Both groups significantly lost weight and reduced waist circumference at 6 months, with some cardiometabolic factors trending accordingly. Significant reduction in self-reported anxiety and perceived stress was seen in the immediate intervention group at 6 months. Retention rate was 93% at 3 months and 86% at 6 months post-baseline. Overall eCMP attendance was high with 59.5-83.8% of immediate and delayed intervention participants attending 50% of the virtual stress management and behavioral lifestyle sessions and 37.8-62.2% attending at least 4 out of 7 in-person physical activity sessions. The intervention received high ratings for satisfaction. Conclusions The technology-assisted eCMP is a feasible and well-accepted intervention and may significantly decrease cardiometabolic risk among high-risk individuals. Trial Registration Clinicaltrials.gov NCT02246400; https://clinicaltrials.gov/ct2/show/NCT02246400 (Archived by WebCite at http://www.webcitation.org/6h6mWWokP) PMID:27234480

Optimization and application of influence function in abrasive jet polishing.

PubMed

Li, Zhaoze; Li, Shengyi; Dai, Yifan; Peng, Xiaoqiang

2010-05-20

We analyze the material removal mechanism of abrasive jet polishing (AJP) technology, based on the fluid impact dynamics theory. Combined with the computational fluid dynamics simulation and process experiments, influence functions at different impingement angles are obtained, which are not of a regular Gaussian shape and are unfit for the corrective figuring of optics. The influence function is then optimized to obtain an ideal Gaussian shape by rotating the oblique nozzle, and its stability is validated through a line scanning experiment. The fluctuation of the influence function can be controlled within +/-5%. Based on this, we build a computed numerically controlled experimental system for AJP, and one flat BK7 optical glass with a diameter of 20mm is polished. After two iterations of polishing, the peak-to-valley value decreases from 1.43lambda (lambda=632.8nm in this paper) to 0.294lambda, and the rms value decreases from 0.195lambda to 0.029lambda. The roughness of this polished surface is within 2nm. The experimental result indicates that the optimized influence function is suitable for precision optics figuring and polishing.

Spherical primary optical telescope (SPOT) segments

NASA Astrophysics Data System (ADS)

Hall, Christopher; Hagopian, John; DeMarco, Michael

2012-09-01

The spherical primary optical telescope (SPOT) project is an internal research and development program at NASA Goddard Space Flight Center. The goals of the program are to develop a robust and cost effective way to manufacture spherical mirror segments and demonstrate a new wavefront sensing approach for continuous phasing across the segmented primary. This paper focuses on the fabrication of the mirror segments. Significant cost savings were achieved through the design, since it allowed the mirror segments to be cast rather than machined from a glass blank. Casting was followed by conventional figuring at Goddard Space Flight Center. After polishing, the mirror segments were mounted to their composite assemblies. QED Technologies used magnetorheological finishing (MRF®) for the final figuring. The MRF process polished the mirrors while they were mounted to their composite assemblies. Each assembly included several magnetic invar plugs that extended to within an inch of the face of the mirror. As part of this project, the interaction between the MRF magnetic field and invar plugs was evaluated. By properly selecting the polishing conditions, MRF was able to significantly improve the figure of the mounted segments. The final MRF figuring demonstrates that mirrors, in the mounted configuration, can be polished and tested to specification. There are significant process capability advantes due to polishing and testing the optics in their final, end-use assembled state.

Study on combined polishing process of aspherical aluminum mirrors

NASA Astrophysics Data System (ADS)

Deng, Jinqiu; Peng, Xiaoqiang; Hu, Hao; Ge, Kunpeng

2017-10-01

The aluminum mirrors are widely used as important optical components in some vital fields such as astronomical instruments or military installations due to the unique advantages of aluminum alloy. In order to simplify the structure of optical system and improve the performance at the same time, it's a tendency that the optics will be designed to aspherical or other freeform shapes. However, the traditional techniques are falling to have adequate abilities to deal with the increasing demands of aluminum optics. For example, the tool marks leaved on the surface from single point diamond turning (SPDT) has obvious adverse effects to optical system. The deterministic and sub-aperture polishing process has showed the potential to fabricate complex shapes over the few years. But it's still recognized as a problem to polish bare aluminum directly because of its soft surface and active chemical characteristics. Therefore, a combination of magnetorheological finishing (MRF) and small tool polishing (STP) is applied to obtain high performance aluminum optics in this paper. A paraboloid aluminum mirror was polished with this proposed method, and the results showed that the surface texture of the sample is restrained from rms 0.409λ (λ=632.8nm) to rms 0.025λ, and the surface roughness is improved from average Ra 6 7nm to Ra 3 4nm.

Fabrication of a grazing incidence telescope by grinding and polishing techniques on aluminum

NASA Technical Reports Server (NTRS)

Gallagher, Dennis; Cash, Webster; Green, James

1991-01-01

The paper describes the fabrication processes, by grinding and polishing, used in making the mirrors for a f/2.8 Wolter type-I grazing incidence telescope at Boulder (Colorado), together with testing procedure used to determine the quality of the images. All grinding and polishing is done on specially designed machine that consists of a horizontal spindle to hold and rotate the mirror and a stroke arm machine to push the various tools back and forth along the mirrors length. The progress is checked by means of the ronchi test during all grinding and polishing stages. Current measurements of the telescope's image quality give a FWHM measurement of 44 arcsec, with the goal set at 5-10 arcsec quality.

Smooth polishing of femtosecond laser induced craters on cemented carbide by ultrasonic vibration method

NASA Astrophysics Data System (ADS)

Wang, H. P.; Guan, Y. C.; Zheng, H. Y.

2017-12-01

Rough surface features induced by laser irradiation have been a challenging for the fabrication of micro/nano scale features. In this work, we propose hybrid ultrasonic vibration polishing method to improve surface quality of microcraters produced by femtosecond laser irradiation on cemented carbide. The laser caused rough surfaces are significantly smoothened after ultrasonic vibration polishing due to the strong collision effect of diamond particles on the surfaces. 3D morphology, SEM and AFM analysis has been conducted to characterize surface morphology and topography. Results indicate that the minimal surface roughness of Ra 7.60 nm has been achieved on the polished surfaces. The fabrication of microcraters with smooth surfaces is applicable to molding process for mass production of micro-optical components.

POLISHING INDUSTRIAL WASTE STREAM EFFLUENTS USING FLY ASH - NATURAL CLAY SORBENT COMBINATION

EPA Science Inventory

A laboratory evaluation of the use of acidic and basic fly ashes, bentonite, bauxite, illite, kaolinite, zeolite, vermiculite, and activated alumina is presented for polishing a 3.8 x 10 to the 6th power liters per day waste stream from the feldspar mining and processing industry...

POLLUTION PREVENTION IN THE SEMICONDUCTOR INDUSTRY THROUGH RECOVERY AND RECYCLING OF GALLIUM AND ARSENIC FROM GAAS POLISHING WASTES

EPA Science Inventory

A process was developed for the recovery of both arsenic and gallium from gallium arsenide polishing wastes. The economics associated with the current disposal techniques utilizing ferric hydroxide precipitation dictate that sequential recovery of toxic arsenic and valuble galliu...

Shallow Seismic Reflection Study of Recently Active Fault Scarps, Mina Deflection, Western Nevada

NASA Astrophysics Data System (ADS)

Black, R. A.; Christie, M.; Tsoflias, G. P.; Stockli, D. F.

2006-12-01

During the spring and summer of 2006 University of Kansas geophysics students and faculty acquired shallow, high resolution seismic reflection data over actively deforming alluvial fans developing across the Emmigrant Peak (in Fish Lake Valley) and Queen Valley Faults in western Nevada. These normal faults represent a portion of the transition from the right-lateral deformation associated with the Walker Lane/Eastern California Shear Zone to the normal and left-lateral faulting of the Mina Deflection. Data were gathered over areas of recent high resolution geological mapping and limited trenching by KU students. An extensive GPR data grid was also acquired. The GPR results are reported in Christie, et al., 2006. The seismic data gathered in the spring included both walkaway tests and a short CMP test line. These data indicated that a very near-surface P-wave to S-wave conversion was taking place and that very high quality S-wave reflections were probably dominating shot records to over one second in time. CMP lines acquired during the summer utilized a 144 channel networked Geode system, single 28 hz geophones, and a 30.06 downhole rifle source. Receiver spacing was 0.5 m, source spacing 1.0m and CMP bin spacings were 0.25m for all lines. Surveying was performed using an RTK system which was also used to develop a concurrent high resolution DEM. A dip line of over 400m and a strike line over 100m in length were shot across the active fan scarp in Fish Lake Valley. Data processing is still underway. However, preliminary interpretation of common-offset gathers and brute stacks indicates very complex faulting and detailed stratigraphic information to depths of over 125m. Depth of information was actually limited by the 1024ms recording time. Several west-dipping normal faults downstep towards the basin. East-dipping antithetic normal faulting is extensive. Several distinctive stratigraphic packages are bound by the faults and apparent unconformitites. A CMP dip line was also run across a large active scarp in Queen Valley near Boundary Peak. Due to slope steepness and extensive boulder armoring shot and receiver locations had to be skipped within several meters of the actual scarp location. Initial structural and stratigraphic interpretations are similar to those in the Fish Lake Valley location. Overall the data prove that the actively deforming fans can be imaged in detail sufficient to perform structural and possibly seismic stratigraphic analysis within the upper one hundred meters of the fans, if not deeper.

Study on Electro-Polishing Process by Niobium-Plate Sample With Artificial Pits

DOE Office of Scientific and Technical Information (OSTI.GOV)

T. Saeki, H. Hayano, S. Kato, M. Nishiwaki, M. Sawabe, W.A. Clemens, R.L. Geng, R. Manus, P.V. Tyagi

2011-07-01

The Electro-polishing (EP) process is the best candidate of final surface-treatment for the production of ILC cavities. Nevertheless, the development of defects on the inner-surface of the Superconducting RF cavity during EP process has not been studied by experimental method. We made artificial pits on the surface of a Nb-plate sample and observed the development of the pit-shapes after each step of 30um-EP process where 120um was removed by EP in total. This article describes the results of this EP-test of Nb-sample with artificial pits.

Simulation of Magnetic Field Assisted Finishing (MFAF) Process Utilizing Smart MR Polishing Tool

NASA Astrophysics Data System (ADS)

Barman, Anwesa; Das, Manas

2017-02-01

Magnetic field assisted finishing process is an advanced finishing process. This process is capable of producing nanometer level surface finish. In this process magnetic field is applied to control the finishing forces using magnetorheological polishing medium. In the current study, permanent magnet is used to provide the required magnetic field in the finishing zone. The working gap between the workpiece and the magnet is filled with MR fluid which is used as the polishing brush to remove surface undulations from the top surface of the workpiece. In this paper, the distribution of magnetic flux density on the workpiece surface and behaviour of MR polishing medium during finishing are analyzed using commercial finite element packages (Ansys Maxwell® and Comsol®). The role of magnetic force in the indentation of abrasive particles on the workpiece surface is studied. A two-dimensional simulation study of the steady, laminar, and incompressible MR fluid flow behaviour during finishing process is carried out. The material removal and surface roughness modelling of the finishing process are also presented. The indentation force by a single active abrasive particle on the workpiece surface is modelled during simulation. The velocity profile of MR fluid with and without application of magnetic field is plotted. It shows non-Newtonian property without application of magnetic field. After that the total material displacement due to one abrasive particle is plotted. The simulated roughness profile is in a good agreement with the experimental results. The conducted study will help in understanding the fluid behavior and the mechanism of finishing during finishing process. Also, the modelling and simulation of the process will help in achieving better finishing performance.

In-depth analysis and characterization of a dual damascene process with respect to different CD

NASA Astrophysics Data System (ADS)

Krause, Gerd; Hofmann, Detlef; Habets, Boris; Buhl, Stefan; Gutsch, Manuela; Lopez-Gomez, Alberto; Kim, Wan-Soo; Thrun, Xaver

2018-03-01

In a 200 mm high volume environment, we studied data from a dual damascene process. Dual damascene is a combination of lithography, etch and CMP that is used to create copper lines and contacts in one single step. During these process steps, different metal CD are measured by different measurement methods. In this study, we analyze the key numbers of the different measurements after different process steps and develop simple models to predict the electrical behavior* . In addition, radial profiles have been analyzed of both inline measurement parameters and electrical parameters. A matching method was developed based on inline and electrical data. Finally, correlation analysis for radial signatures is presented that can be used to predict excursions in electrical signatures.

[The fight of the communist authorities with the Catholic Church in the health service in Poland (1945-1970)].

PubMed

Jastrzebowski, Zbigniew

2005-01-01

The article shows the process of nationalization of Polish hospitals run by religious congregations and elimination of priests runs from medical care. The process lasted until resignation of Władysław Gomułka from the post of the first secretary of the Polish United Worker's Party. We can distinguish two periods of the process: 1948-1953 of nationalized of the congregation hospitals and 1960 - 1970 when this presence of the Catholic Church in the health was limited to indispensable minimum.

[Validation of the Polish version of The Authentic Leadership Questionnaire for the of evaluation purpose of nursing management staff in national hospital wards].

PubMed

Sierpińska, Lidia

2013-09-01

The Authentic Leadership Questionnaire (ALQ) is a standardized research instrument for the evaluation of individual elements of leader's conduct which contribute to the authentic leadership. The application of this questionnaire in Polish conditions required to carry out the validation process. The aim of the study was to evaluate of validity and reliability of the Polish version of the American research instrument for the needs of evaluation of authenticity of leadership of the nursing management in Polish hospitals. The study covered 286 nurses (143 head nurses and 143 of their subordinates) employed in 45 hospitals in Poland. Theoretical validity of the instrument was evaluated using Fisher's transformation (r-Person correlation coefficient), while the criterion validity of the ALQ was evaluated using rho-Spearman correlation coefficient and the BOHIPSZO questionnaire. The reliability of the ALQ was assessed by means of the Cronbach-alpha coefficient. The ALQ questionnaire applied for the evaluation of authenticity of leadership of the nursing management in Polish hospital wards shows an acceptable theoretical and criterion validity and reliability (Cronbach-alpha coefficient 0.80). The Polish version of the ALQ is valid and reliable, and may be applied in studies concerning the evaluation of authenticity of leadership of the nursing management in Polish hospital wards.

Clomipramine and Benznidazole Act Synergistically and Ameliorate the Outcome of Experimental Chagas Disease

PubMed Central

García, Mónica Cristina; Ponce, Nicolás Eric; Sanmarco, Liliana Maria; Manzo, Rubén Hilario; Jimenez-Kairuz, Alvaro Federico

2016-01-01

Chagas disease is an important public health problem in Latin America, and its treatment by chemotherapy with benznidazole (BZ) or nifurtimox remains unsatisfactory. In order to design new alternative strategies to improve the current etiological treatments, in the present work, we comprehensively evaluated the in vitro and in vivo anti-Trypanosoma cruzi effects of clomipramine (CMP) (a parasite-trypanothione reductase-specific inhibitor) combined with BZ. In vitro studies, carried out using a checkerboard technique on trypomastigotes (T. cruzi strain Tulahuen), revealed a combination index (CI) of 0.375, indicative of a synergistic effect of the drug combination. This result was correlated with the data obtained in infected BALB/c mice. We observed that during the acute phase (15 days postinfection [dpi]), BZ at 25 mg/kg of body weight/day alone decreased the levels of parasitemia compared with those of the control group, but when BZ was administered with CMP, the drug combination completely suppressed the parasitemia due to the observed synergistic effect. Furthermore, in the chronic phase (90 dpi), mice treated with both drugs showed less heart damage as assessed by the histopathological analysis, index of myocardial inflammation, and levels of heart injury biochemical markers than mice treated with BZ alone at the reference dose (100 mg/kg/day). Collectively, these data support the notion that CMP combined with low doses of BZ diminishes cardiac damage and inflammation during the chronic phase of cardiomyopathy. The synergistic activity of BZ-CMP clearly suggests a potential drug combination for Chagas disease treatment, which would allow a reduction of the effective dose of BZ and an increase in therapeutic safety. PMID:27067322

Chinese medicine patterns in patients with post-stroke dementia.

PubMed

Tang, Nou-Ying; Liu, Chung-Hsiang; Liu, Hsu-Jan; Li, Tsai-Chung; Liu, Jui-Chen; Chen, Ping-Kun; Hsieh, Ching-Liang

2012-04-01

A stroke often results in post-stroke dementia, a rapid decline in memory and intelligence causing dysfunctions in daily life. The Chinese medicine doctor uses 4 examinations of inspection, listening, smelling, and feeling to determine the Chinese medicine pattern (CMP). Therefore, the purpose of the present study was to investigate the CMP in patients with post-stroke dementia. A total of 101 stroke patients were examined, consistent with the DSM IV diagnostic criteria of the American Psychiatric Association, as well as the National Institute of Neurological Disorders and Stroke-Association International pour Ia Recherche et I'Enseignement en Neurosciences vascular dementia diagnostic criteria of post-stroke dementia. 100 patients (99.0%) were KEDP (kidney essence deficiency pattern, shèn jīng kuī xū zhèng, ), 83 patients were AHLYP (ascendant hyperactivity of liver yang pattern, gān yáng shàng kàng zhèng, ), 83 patients were QBDP (qi-blood deficiency pattern, qì xuè kuī xū zhèng, ), 81 patients were SBOCP (static blood obstructing the collaterals pattern, yū xuè zǔ luò zhèng, ), 72 patients were BSTRP (bowels stagnation turbidity retention pattern, fǔ zhì zhuó liú zhèng, ), 50 patients were FHIEP (fire heat interior excess pattern, huǒ rè nèi sheng zhèng, ), and 39 participants (38.6%) were PTOOP (phlegm turbidity obstructing the orifices pattern, tán zhuó zǔ qiào zhèng, ); one to 31 patients have at least 2 CMPs simultaneously. In conclusion, the most CMP is KEDP CMP in the post-stroke dementia patients, and one patient may have one or at least 2 CMPs simultaneously.

Implementing a hybrid approach to select patients for care management: variations across practices.

PubMed

Vogeli, Christine; Spirt, Jenna; Brand, Richard; Hsu, John; Mohta, Namita; Hong, Clemens; Weil, Eric; Ferris, Timothy G

2016-05-01

Appropriate selection of patients is key to the success of care management programs (CMPs). Hybrid patient selection approaches, in which large data assets are culled to develop a list of patients for more targeted clinical review, are increasingly common. We sought to describe the patient and practice characteristics associated with high-risk patient identification and selection for a CMP during clinical review, and to explore variation across primary care practices. Retrospective cohort study. Standardized estimates of Medicare beneficiaries identified as high risk for poor outcomes and high medical expense, and appropriate for a CMP within a large Pioneer Accountable Care Organization, were developed using mixed effects logistic models. Study subjects were 2685 Medicare beneficiaries aged over 18 (includes individuals eligible for Medicare due to a disability) aligned to 35 primary care practices in 2013. Independent predictors of patient identification as high risk include older age; higher risk score; recent increases in medical conditions; higher numbers of medical hospitalizations, skilled nursing facility days, and primary care physician visits; and shorter relationships with the primary care physician. Older age, and lower income, but no prior hospice use were independently associated with patient selection for a CMP among the subset of patients identified as being high risk. Adjusted predicted percents of high-risk patients varied significantly across practices overall and for 5 of the 6 patient characteristics that were independently associated with identification as high risk. Inconsistency in high-risk patient identification and selection for a CMP may reflect differences in practice resources, but also highlight the need for continual training and feedback in order to protect against unintentional biases.

Particulate emissions calculations from fall tillage operations using point and remote sensors.

PubMed

Moore, Kori D; Wojcik, Michael D; Martin, Randal S; Marchant, Christian C; Bingham, Gail E; Pfeiffer, Richard L; Prueger, John H; Hatfield, Jerry L

2013-07-01

Soil preparation for agricultural crops produces aerosols that may significantly contribute to seasonal atmospheric particulate matter (PM). Efforts to reduce PM emissions from tillage through a variety of conservation management practices (CMPs) have been made, but the reductions from many of these practices have not been measured in the field. A study was conducted in California's San Joaquin Valley to quantify emissions reductions from fall tillage CMP. Emissions were measured from conventional tillage methods and from a "combined operations" CMP, which combines several implements to reduce tractor passes. Measurements were made of soil moisture, bulk density, meteorological profiles, filter-based total suspended PM (TSP), concentrations of PM with an equivalent aerodynamic diameter ≤10 μm (PM) and PM with an equivalent aerodynamic diameter ≤2.5 μm (PM), and aerosol size distribution. A mass-calibrated, scanning, three-wavelength light detection and ranging (LIDAR) procedure estimated PM through a series of algorithms. Emissions were calculated via inverse modeling with mass concentration measurements and applying a mass balance to LIDAR data. Inverse modeling emission estimates were higher, often with statistically significant differences. Derived PM emissions for conventional operations generally agree with literature values. Sampling irregularities with a few filter-based samples prevented calculation of a complete set of emissions through inverse modeling; however, the LIDAR-based emissions dataset was complete. The CMP control effectiveness was calculated based on LIDAR-derived emissions to be 29 ± 2%, 60 ± 1%, and 25 ± 1% for PM, PM, and TSP size fractions, respectively. Implementation of this CMP provides an effective method for the reduction of PM emissions. Copyright © by the American Society of Agronomy, Crop Science Society of America, and Soil Science Society of America, Inc.

ROLES OF ADIPOCYTES AND FIBROBLASTS IN ACTIVATION OF THE ALTERNATIVE PATHWAY OF COMPLEMENT IN INFLAMMATORY ARTHRITIS IN MICE

PubMed Central

Arend, William P.; Mehta, Gaurav; Antonioli, Alexandra H.; Takahashi, Minoru; Takahashi, Kazue; Stahl, Gregory L.; Holers, V. Michael; Banda, Nirmal K.

2013-01-01

The complement system is involved in mediation of joint damage in rheumatoid arthritis, with evidence suggesting activation of both the classical and alternative pathways (AP). The AP is both necessary and sufficient to mediate collagen antibody-induced arthritis (CAIA), an experimental animal model of immune complex (IC)-induced joint disease. The AP in mice is dependent on MASP-1/3 cleavage of pro-factor D (pro-FD) into mature FD. The objectives of the present study were to determine the cells synthesizing MASP-1/3 and pro-FD in synovial tissue. CAIA was studied in wild-type C57BL/6 mice, and the localization of mRNA and protein for FD and MASP-1/3 in synovial adipose tissue (SAT) and fibroblast-like synoviocytes (FLS) was determined using various techniques, including laser capture micro-dissection (LCM). SAT was the sole source of mRNA for pro-FD. Cultured differentiated 3T3 adipocytes, a surrogate for SAT, produced pro-FD but no mature FD. FLS were the main source of MASP-1/3 mRNA and protein. Using cartilage micro-particles (CMP) coated with anti-collagen mAb and serum from MASP-1/3−/− mice as a source of factor B, pro-FD in 3T3 supernatants was cleaved into mature FD by MASP-1/3 in FLS supernatants. The mature FD was eluted from the CMP, and was not present in the supernatants from the incubation with CMP, indicating that cleavage of pro-FD into mature FD by MASP-1 occurred on the CMP. These results demonstrate that pathogenic activation of the AP may occur in the joint through IC adherent to cartilage and the local production of necessary AP proteins by adipocytes and FLS. PMID:23650618

Self-reported work ability and work performance in workers with chronic nonspecific musculoskeletal pain.

PubMed

de Vries, Haitze J; Reneman, Michiel F; Groothoff, Johan W; Geertzen, Jan H B; Brouwer, Sandra

2013-03-01

To assess self-reported work ability and work performance of workers who stay at work despite chronic nonspecific musculoskeletal pain (CMP), and to explore which variables were associated with these outcomes. In a cross-sectional study we assessed work ability (Work Ability Index, single item scale 0-10) and work performance (Health and Work Performance Questionnaire, scale 0-10) among 119 workers who continued work while having CMP. Scores of work ability and work performance were categorized into excellent (10), good (9), moderate (8) and poor (0-7). Hierarchical multiple regression and logistic regression analysis was used to analyze the relation of socio-demographic, pain-related, personal- and work-related variables with work ability and work performance. Mean work ability and work performance were 7.1 and 7.7 (poor to moderate). Hierarchical multiple regression analysis revealed that higher work ability scores were associated with lower age, better general health perception, and higher pain self-efficacy beliefs (R(2) = 42 %). Higher work performance was associated with lower age, higher pain self-efficacy beliefs, lower physical work demand category and part-time work (R(2) = 37 %). Logistic regression analysis revealed that work ability ≥8 was significantly explained by age (OR = 0.90), general health perception (OR = 1.04) and pain self-efficacy (OR = 1.15). Work performance ≥8 was explained by pain self-efficacy (OR = 1.11). Many workers with CMP who stay at work report poor to moderate work ability and work performance. Our findings suggest that a subgroup of workers with CMP can stay at work with high work ability and performance, especially when they have high beliefs of pain self-efficacy. Our results further show that not the pain itself, but personal and work-related factors relate to work ability and work performance.

Enhanced efficacy of anticonvulsants when combined with levetiracetam in soman-exposed rats.

PubMed

Myhrer, Trond; Enger, Siri; Jonassen, Morten; Aas, Pål

2011-12-01

Results from studies based on microinfusions into seizure controlling brain sites (area tempestas, medial septum, perirhinal cortex, posterior piriform cortex) have shown that procyclidine, muscimol, caramiphen, and NBQX, but not ketamine, exert anticonvulsant effects against soman-induced seizures. The purpose of the present study was to examine whether levetiracetam (Keppra(®)) may enhance the anticonvulsant potency of the above drugs to become optimally effective when used systemically. Levetiracetam has a unique profile in preclinical models of epilepsy and has been shown to increase the potency of other antiepileptic drugs. The rats were pretreated with pyridostigmine (0.1mg/kg) to enhance survival and received anticonvulsants 20 min after onset of seizures evoked by soman (1.15 × LD(50)). The results showed that no single drug was able to terminate seizure activity. However, when levetiracetam (LEV; 50mg/kg) was combined with either procyclidine (PCD; 10mg/kg) or caramiphen (CMP; 10mg/kg) complete cessation of seizures was achieved, but the nicotinic antagonist mecamylamine was needed to induce full motor rest in some rats. In a subsequent experiment, rats were pretreated with HI-6 (125 mg/kg) to enhance survival and treatment started 40 min following seizure onset of a soman dose of 1.6 × LD(50). LEV (50mg/kg) combined with either PCD (20mg/kg) or CMP (20mg/kg) terminated seizure activity, but the survival rate was considerably higher for LEV+PCD than LEV+CMP. Both therapies could also save the lives of rats that were about to die 5-10 min after seizure onset. Thus, the combination of LEV and PCD or CMP may make up a model of a future autoinjector being effective regardless of the time of application. Copyright © 2011 Elsevier Inc. All rights reserved.

Clinical efficacy of EDTA ultrasonic activation in the reduction of endotoxins and cultivable bacteria.

PubMed

Herrera, D R; Martinho, F C; de-Jesus-Soares, A; Zaia, A A; Ferraz, C C R; Almeida, J F A; Gomes, B P F A

2017-10-01

This clinical study was conducted to investigate the influence of 17% ethylenediaminetetraacetic acid (EDTA) ultrasonic activation after chemomechanical preparation (CMP) on eliminating/reducing oral bacterial lipopolysaccharides (known as endotoxins) and cultivable bacteria in teeth with pulp necrosis and apical periodontitis. Samples were taken from 24 root canals at several clinical periods: S1 - before CMP; S2 - after CMP; S3 - after EDTA: G1 - with ultrasonic activation (n = 12) and G2 - without ultrasonic activation (n = 12). Root canals were instrumented using Mtwo rotary files. Culture techniques were used to determine the number of colony-forming units (CFU). Limulus amebocyte lysate (LAL) was used to measure endotoxin levels. Friedman's and Wilcoxon signed-rank tests were used to compare the amount of bacteria and endotoxin levels in each period (P < 0.05). Endotoxins and cultivable bacteria were recovered in 100% of the initial samples (S1). CMP was effective in reducing endotoxins and bacterial load (all with P < 0.05). Higher values of endotoxin reduction were achieved with EDTA ultrasonic activation [G1, 0.02 EU mL -1 (range 0.01-0.75)] compared with the no activation group [G2, 1.13 EU mL -1 (range 0.01-8.34)] (P < 0.05). Regarding bacterial reduction, no statistically significant difference was found in S3, regardless of the group (G1, G2, P > 0.05). Chemomechanical preparation was effective in reducing bacteria and endotoxins, but could not completely eliminate them. The ultrasonic activation of EDTA was effective in further reducing endotoxin levels in the root canals of teeth with pulp necrosis and apical periodontitis. © 2016 International Endodontic Journal. Published by John Wiley & Sons Ltd.

Ternary borate-nucleoside complex stabilization by Ribonuclease A demonstrates phosphate mimicry

PubMed Central

Gabel, Scott A.; London, Robert E.

2010-01-01

Phosphate esters play a central role in cellular energetics, biochemical activation, signal transduction and conformational switching. The structural homology of the borate anion with phosphate, combined with its ability to spontaneously esterify hydroxyl groups, suggested that phosphate-ester recognition sites on proteins might exhibit significant affinity for non-enzymatically formed borate esters. 11B NMR studies and activity measurements on ribonuclease A in the presence of borate and several cytidine analogs demonstrate the formation of a stable ternary RNase A•3′-deoxycytidine-2′-borate ternary complex that mimics the complex formed between RNase A and a 2′-cytidine monophosphate (2′-CMP) inhibitor. Alternatively, no slowly exchanging borate resonance is observed for a ternary RNase A, borate, 2′-deoxycytidine mixture, demonstrating the critical importance of the 2′-hydroxyl group for complex formation. Titration of the ternary complex with 2′-CMP shows that it can displace the bound borate ester with a binding constant that is close to the reported inhibition constant of RNase A by 2′CMP. RNase A binding of a cyclic cytidine-2′,3′-borate ester, which is a structural homolog of the cytidine-2′,3′-cyclic phosphate substrate, could also be demonstrated. The apparent dissociation constant for the cytidine-2′,3′-borate•RNase A complex is 0.8 mM, which compares with a Michaelis constant of 11 mM for cCMP at pH 7, indicating considerably stronger binding. However, the value is 1000-fold larger than the reported dissociation constant of the RNase A complex with uridine-vanadate. These results are consistent with recent reports suggesting that in situ formation of borate esters that mimic the corresponding phosphate esters support enzyme catalysis. PMID:17957392

USSR and Eastern Europe Scientific Abstracts, Geophysics, Astronomy and Space, Number 426

DTIC Science & Technology

1978-08-01

Report on "Soyuz-30" Docking.., 22 Comments on " Sirena " Experiment Aboard "Salyut-6" 24 Vereshchetin Comments on Polish Contribution to...began the joint Polish-Soviet materials processing experiment " Sirena " in the "Splav" apparatus. They were also engaged in physical exercise...34 Sirena " materials processing experiment was continued as the cosmonauts monitored the operation of the "Splav" apparatus and the temperature regime of

Advances in photonic MOEMS-MEMS device thinning and polishing

NASA Astrophysics Data System (ADS)

McAneny, James J.; Kennedy, Mark; McGroggan, Tom

2010-02-01

As devices continue to increase in density and complexity, ever more stringent specifications are placed on the wafer scale equipment manufacturers to produce higher quality and higher output. This results in greater investment and more resource being diverted into producing tools and processes which can meet the latest demanding criteria. Substrate materials employed in the fabrication process range from Silicon through InP and include GaAs, InSb and other optical networking or waveguide materials. With this diversity of substrate materials presented, controlling the geometries and surfaces grows progressively more challenging. This article highlights the key parameters which require close monitoring and control in order to produce highly precise wafers as part of the fabrication process. Several as cut and commercially available standard polished wafer materials were used in empirical trials to test tooling options in generating high levels of geometric control over the dimensions while producing high quality surface finishes. Specific attention was given to the measurement and control of: flatness; parallelism/TTV; surface roughness and final target thickness as common specifications required by the industry. By combining the process variables of: plate speed, download pressure, slurry flow rate and concentration, pad type and wafer travel path across the polish pad, the effect of altering these variables was recorded and analysed to realize the optimum process conditions for the materials under test. The results being then used to design improved methods and tooling for the thinning and polishing of photonic materials applied to MOEMS-MEMS device fabrication.

40 CFR 426.112 - Effluent limitations guidelines representing the degree of effluent reduction attainable by the...

Code of Federal Regulations, 2014 CFR

2014-07-01

... technology currently available (BPT). (The fluoride and lead limitations are applicable to the abrasive polishing and acid polishing waste water streams while the TSS, oil, and pH limitations are applicable to the entire process waste water stream): Effluent characteristic Effluent limitations Maximum for any 1...

40 CFR 426.112 - Effluent limitations guidelines representing the degree of effluent reduction attainable by the...

Code of Federal Regulations, 2012 CFR

2012-07-01

... technology currently available (BPT). (The fluoride and lead limitations are applicable to the abrasive polishing and acid polishing waste water streams while the TSS, oil, and pH limitations are applicable to the entire process waste water stream): Effluent characteristic Effluent limitations Maximum for any 1...

40 CFR 426.112 - Effluent limitations guidelines representing the degree of effluent reduction attainable by the...

Code of Federal Regulations, 2013 CFR

2013-07-01

... technology currently available (BPT). (The fluoride and lead limitations are applicable to the abrasive polishing and acid polishing waste water streams while the TSS, oil, and pH limitations are applicable to the entire process waste water stream): Effluent characteristic Effluent limitations Maximum for any 1...

Polish Complementary Schools in Iceland and England

ERIC Educational Resources Information Center

Zielinska, Malgorzata; Kowzan, Piotr; Ragnarsdóttir, Hanna

2014-01-01

Since 2004, the opening of labour markets has spurred a considerable number of Poles to emigrate e.g. to Iceland and England. Families with school age children have had the challenge of adapting to foreign environments and school systems. Polish complementary schools have played an important, albeit ambivalent, role in this process. Through focus…

The pressure control technology of the active stressed lap

NASA Astrophysics Data System (ADS)

Li, Ying; Wang, Daxing

2010-10-01

The active stressed lap polishing technology is a kind of new polishing technology that can actively deform the lap surface to become an off-axis asphere according to different lap position on mirror surface and different angle of lap. The pressure of the lap on the mirror is an important factor affecting the grinding efficiency of the optics mirror. The active stressed lap technology using dynamic pressure control solution in the process of polishing astronomical Aspheric Mirror with faster asphericity will provide the advantage like high polishing speed and natural smooth, etc. This article puts emphases on the pressure control technology of the active stressed lap technology. It requires that the active stressed lap keeps symmetrical vertical compression on the mirrors in the process of grinding mirrors. With a background of an active stressed lap 450mm in diameter, this article gives an outline of the pressure control organization, analyzes the principle of pressure control and proposes the limitations of the present pressure control organization and the relevant solutions, designs a digital pressure controller with C32-bit RISC embedded and gives the relevant experimental test result finally.

Synchrotron/crystal sample preparation

NASA Technical Reports Server (NTRS)

Johnson, R. Barry

1993-01-01

The Center for Applied Optics (CAO) of the University of Alabama in Huntsville (UAH) prepared this final report entitled 'Synchrotron/Crystal Sample Preparation' in completion of contract NAS8-38609, Delivery Order No. 53. Hughes Danbury Optical Systems (HDOS) is manufacturing the Advanced X-ray Astrophysics Facility (AXAF) mirrors. These thin-walled, grazing incidence, Wolter Type-1 mirrors, varying in diameter from 1.2 to 0.68 meters, must be ground and polished using state-of-the-art techniques in order to prevent undue stress due to damage or the presence of crystals and inclusions. The effect of crystals on the polishing and grinding process must also be understood. This involves coating special samples of Zerodur and measuring the reflectivity of the coatings in a synchrotron system. In order to gain the understanding needed on the effect of the Zerodur crystals by the grinding and polishing process, UAH prepared glass samples by cutting, grinding, etching, and polishing as required to meet specifications for witness bars for synchrotron measurements and for investigations of crystals embedded in Zerodur. UAH then characterized these samples for subsurface damage and surface roughness and figure.

Advanced space optics development in freeform optics design, ceramic polishing, rapid and extreme freeform polishing

NASA Astrophysics Data System (ADS)

Geyl, R.; Leplan, H.; Ruch, E.

2017-09-01

In this paper Safran-Reosc wants to share with the space community its recent work performed in the domain of space optics. Our main topic is a study about the advantages that freeform optical surfaces can offer to advanced space optics in term of compactness or performances. We have separated smart and extreme freeform in our design exploration work. Our second topic is to answer about the immediate question following: can we manufacture and test these freeform optics? We will therefore present our freeform optics capability, report recent achievement in extreme aspheric optics polishing and introduce to the industrialisation process of large off axis optics polishing for the ESO Extremely Large Telescope primary mirror segments. Thirdly we present our R-SiC polishing layer technology for SiC material. This technique has been developed to reduce costs, risks and schedule in the manufacturing of advanced SiC optics for Vis and IR applications.

Study on surface roughness evolvement of Nd-doped phosphate glass after IBF

NASA Astrophysics Data System (ADS)

Li, Furen; Xie, Xuhui; Zhou, Lin; Tie, Guipeng; Hu, Hao

2016-10-01

Nd doped phosphate glass is widely used as gain media in high power laser system. It is traditionally polished with the annular polishing technology. The edge effect is inevitable in annular polishing process and it results in the low manufacturing efficiency. Ion Beam Figuring (IBF) is a highly deterministic, non-contact method for the ultra-precision optics fabrication. So the edge effect is avoided. Nanometer and sub-nanometer precision is realizable in IBF. In this paper, Nd doped phosphate glass was polished with IBF, and the evolvement of surface roughness was emphasized. The roughness of surface polished with ion beam at normal and oblique incidence was researched. The oblique incident angle was 45°. The surface roughness was measured with the white light interferometer. No evident change was observed. This means that the pre-finish roughness can be preserved in IBF. The results denote that IBF is a feasible method to correct the contour errors of Nd doped phosphate glass, and the roughness will not be coarsened.

Ion beam figuring of silicon aspheres

NASA Astrophysics Data System (ADS)

Demmler, Marcel; Zeuner, Michael; Luca, Alfonz; Dunger, Thoralf; Rost, Dirk; Kiontke, Sven; Krüger, Marcus

2011-03-01

Silicon lenses are widely used for infrared applications. Especially for portable devices the size and weight of the optical system are very important factors. The use of aspherical silicon lenses instead of spherical silicon lenses results in a significant reduction of weight and size. The manufacture of silicon lenses is more challenging than the manufacture of standard glass lenses. Typically conventional methods like diamond turning, grinding and polishing are used. However, due to the high hardness of silicon, diamond turning is very difficult and requires a lot of experience. To achieve surfaces of a high quality a polishing step is mandatory within the manufacturing process. Nevertheless, the required surface form accuracy cannot be achieved through the use of conventional polishing methods because of the unpredictable behavior of the polishing tools, which leads to an unstable removal rate. To overcome these disadvantages a method called Ion Beam Figuring can be used to manufacture silicon lenses with high surface form accuracies. The general advantage of the Ion Beam Figuring technology is a contactless polishing process without any aging effects of the tool. Due to this an excellent stability of the removal rate without any mechanical surface damage is achieved. The related physical process - called sputtering - can be applied to any material and is therefore also applicable to materials of high hardness like Silicon (SiC, WC). The process is realized through the commercially available ion beam figuring system IonScan 3D. During the process, the substrate is moved in front of a focused broad ion beam. The local milling rate is controlled via a modulated velocity profile, which is calculated specifically for each surface topology in order to mill the material at the associated positions to the target geometry. The authors will present aspherical silicon lenses with very high surface form accuracies compared to conventionally manufactured lenses.

Optical RAM-enabled cache memory and optical routing for chip multiprocessors: technologies and architectures

NASA Astrophysics Data System (ADS)

Pleros, Nikos; Maniotis, Pavlos; Alexoudi, Theonitsa; Fitsios, Dimitris; Vagionas, Christos; Papaioannou, Sotiris; Vyrsokinos, K.; Kanellos, George T.

2014-03-01

The processor-memory performance gap, commonly referred to as "Memory Wall" problem, owes to the speed mismatch between processor and electronic RAM clock frequencies, forcing current Chip Multiprocessor (CMP) configurations to consume more than 50% of the chip real-estate for caching purposes. In this article, we present our recent work spanning from Si-based integrated optical RAM cell architectures up to complete optical cache memory architectures for Chip Multiprocessor configurations. Moreover, we discuss on e/o router subsystems with up to Tb/s routing capacity for cache interconnection purposes within CMP configurations, currently pursued within the FP7 PhoxTrot project.

Chromatic multifocal pupillometer for objective early diagnosis of mild cognitive impairment

NASA Astrophysics Data System (ADS)

Rotenstreich, Ygal; Ben-Ner, Daniel; Sharvit-Ginon, Inbal; Ravona-Springer, Ramit; Beeri, Michal; Sher, Ifat

2017-02-01

The pupil responses of 15 cognitively normal subjects (ages 60-74) were examined in response to 76 focal red and blue light stimuli using a chromatic multifocal pupillometer (CMP). Subjects with low cognitive scores as determined as by Montreal Cognitive Assessment testing, presented significantly weaker and sluggish pupil responses in peripheral and central locations of the visual field in response to red and blue light. Our findings suggests that the CMP may present a novel objective, non-invasive, low cost technique for early diagnosis of cognitive decline that may serve for Alzheimer Disease prevention and as sensitive outcome measure of therapeutic effects.

Micro Computer Feedback Report for the Strategic Leader Development Inventory

DTIC Science & Technology

1993-05-01

POS or NEG variables CALL CREATE MEM DIR ;make a memory directory JC SELS ;exat I error CALL SELECT-SCREEN ;dlsplay select screen JC SEL4 ;no flles in...get keyboaI Input CMP AL,1Bh3 ;ls I an Esc key ? JNZ SEL2 ;X not goto nrod test G-95 JMP SEL4 ;Exit SEL2: CMP AL,OOh Iskapick? JZ SEL ;I YES exit loop...position CALL READ DATE ;gat DOS daoe od 4e CALL F4ND -ERO ;kxlae OW In data ue JC SEL.5 SEL4 : CALL RELEASE MEM DIR ;release meu block CLC ;cler carry fag

Relation between isokinetic muscle strength and functional capacity in recreational athletes with chondromalacia patellae.

PubMed

Yildiz, Y; Aydin, T; Sekir, U; Cetin, C; Ors, F; Alp Kalyon, T

2003-12-01

To investigate the effects of isokinetic exercise on pain and functional test scores of recreational athletes with chondromalacia patellae (CMP) and to examine the correlation between isokinetic parameters and functional tests or pain score. The functional ability of 30 recreational athletes with unilateral CMP was evaluated using six different tests. Pain scores were assessed during daily activities before and after the treatment protocol. Isokinetic exercise sessions were carried out at angular velocities of 60 degrees /s (25-90 degrees range of flexion) and 180 degrees /s (full range). These sessions were repeated three times a week for six weeks. Quadriceps and hamstring peak torque, total work, and endurance ratios had improved significantly after the treatment, as did the functional parameters and pain scores. There was a poor correlation between the extensor endurance ratio and one leg standing test. A moderate correlation between the visual analogue scale and the extensor endurance ratio or flexion endurance ratio was also found. The isokinetic exercise programme used in this study had a positive effect on muscle strength, pain score, and functional ability of knees with CMP. The improvement in the functional capacity did not correlate with the isokinetic parameters.

Genomic and molecular analysis of phage CMP1 from Clavibacter michiganensis subspecies michiganensis

PubMed Central

Wittmann, Johannes; Gartemann, Karl-Heinz; Eichenlaub, Rudolf

2011-01-01

Bacteriophage CMP1 is a member of the Siphoviridae family that infects specifically the plant-pathogen Clavibacter michiganensis subsp. michiganensis. The linear double- stranded DNA is terminally redundant and not circularly permuted. The complete nucleotide sequence of the bacteriophage CMP1 genome consists of 58,652 bp including the terminal redundant ends of 791 bp. The G+C content of the phage (57%) is significantly lower than that of its host (72.66%). 74 potential open reading frames were identified and annotated by different bioinformatic tools. Two large clusters which encode the early and the late functions could be identified which are divergently transcribed. There are only a few hypothetical gene products with conserved domains and significant similarity to sequences from the databases. Functional analyses confirmed the activity of four gene products, an endonuclease, an exonuclease, a single-stranded DNA binding protein and a thymidylate synthase. Partial genomic sequences of CN77, a phage of Clavibacter michiganensis subsp. nebraskensis, revealed a similar genome structure and significant similarities on the level of deduced amino acid sequences. An endolysin with peptidase activity has been identified for both phages, which may be good tools for disease control of tomato plants against Clavibacter infections. PMID:21687530

Genomic and molecular analysis of phage CMP1 from Clavibacter michiganensis subspecies michiganensis.

PubMed

Wittmann, Johannes; Gartemann, Karl-Heinz; Eichenlaub, Rudolf; Dreiseikelmann, Brigitte

2011-01-01

Bacteriophage CMP1 is a member of the Siphoviridae family that infects specifically the plant-pathogen Clavibacter michiganensis subsp. michiganensis. The linear double- stranded DNA is terminally redundant and not circularly permuted. The complete nucleotide sequence of the bacteriophage CMP1 genome consists of 58,652 bp including the terminal redundant ends of 791 bp. The G+C content of the phage (57%) is significantly lower than that of its host (72.66%). 74 potential open reading frames were identified and annotated by different bioinformatic tools. Two large clusters which encode the early and the late functions could be identified which are divergently transcribed. There are only a few hypothetical gene products with conserved domains and significant similarity to sequences from the databases. Functional analyses confirmed the activity of four gene products, an endonuclease, an exonuclease, a single-stranded DNA binding protein and a thymidylate synthase. Partial genomic sequences of CN77, a phage of Clavibacter michiganensis subsp. nebraskensis, revealed a similar genome structure and significant similarities on the level of deduced amino acid sequences. An endolysin with peptidase activity has been identified for both phages, which may be good tools for disease control of tomato plants against Clavibacter infections.

Impact of a Traditional Dietary Supplement with Coconut Milk and Soya Milk on the Lipid Profile in Normal Free Living Subjects

PubMed Central

Ekanayaka, R. A. I.; Ekanayaka, N. K.; Perera, B.; De Silva, P. G. S. M.

2013-01-01

Background. The effects of coconut fat and soya fat on serum lipids are controversial. This study was designed to investigate the lipid effects of coconut milk and soya milk supplementation on the lipid profile of free living healthy subjects. Methods. Sixty (60) healthy volunteers aged 18–57 years were given coconut milk porridge (CMP) for 5 days of the week for 8 weeks, followed by a 2-week washout period, subsequent to which they received isoenergetic soya milk porridge (SMP) for 8 weeks. Results. The LDL (low density lipoprotein) levels decreased with CMP and reached statistical significance in the total study population and in the >130 baseline LDL group. The HDL (high density lipoprotein) levels rose significantly with CMP supplementation (P = 0.000). Conclusions. We conclude that coconut fat in the form of CM does not cause a detrimental effect on the lipid profile in the general population and in fact is beneficial due to the decrease in LDL and rise in HDL. SMP will be of benefit only in those whose baseline LDL levels are elevated. PMID:24282632

Deoxyribonucleic Acid Replication and Expression of Early and Late Bacteriophage Functions in Bacillus subtilis

PubMed Central

Pène, Jacques J.; Marmur, Julius

1967-01-01

The role of deoxyribonucleic acid (DNA) replication in the control of the synthesis of deoxycytidylate (dCMP) deaminase and lysozyme in Bacillus subtilis infected with bacteriophage 2C has been studied. These phage-induced enzymes are synthesized at different times during the latent period. It was shown by actinomycin inhibition that the formation of the late enzyme (lysozyme) required messenger ribonucleic acid (mRNA) synthesized de novo after the initiation of translation of mRNA which specifies the early function (dCMP deaminase). The inhibition of phage DNA synthesis by mitomycin C prevented the synthesis of lysozyme only when added before the onset of phage DNA replication, but it did not affect the synthesis or action of dCMP deaminase when added at any time during the latent period. Treatment of infected cells with mitomycin C after phage DNA synthesis had reached 8 to 10% of its maximal rate resulted in the production of normal amounts of lysozyme. These observations suggest that mRNA specifying early enzymes can be transcribed from parental (and probably also from progeny) DNA, whereas late functional messengers can be transcribed only after the formation of progeny DNA. PMID:4990039

Experimental Evaluation of the "Polished Panel Optical Receiver" Concept on the Deep Space Network's 34 Meter Antenna

NASA Technical Reports Server (NTRS)

Vilnrotter, Victor A.

2012-01-01

The potential development of large aperture ground-based "photon bucket" optical receivers for deep space communications has received considerable attention recently. One approach currently under investigation proposes to polish the aluminum reflector panels of 34-meter microwave antennas to high reflectance, and accept the relatively large spotsize generated by even state-of-the-art polished aluminum panels. Here we describe the experimental effort currently underway at the Deep Space Network (DSN) Goldstone Communications Complex in California, to test and verify these concepts in a realistic operational environment. A custom designed aluminum panel has been mounted on the 34 meter research antenna at Deep-Space Station 13 (DSS-13), and a remotely controlled CCD camera with a large CCD sensor in a weather-proof container has been installed next to the subreflector, pointed directly at the custom polished panel. Using the planet Jupiter as the optical point-source, the point-spread function (PSF) generated by the polished panel has been characterized, the array data processed to determine the center of the intensity distribution, and expected communications performance of the proposed polished panel optical receiver has been evaluated.

Polishability of thin electrolytic and electroless NiP layers

NASA Astrophysics Data System (ADS)

Kinast, Jan; Beier, Matthias; Gebhardt, Andreas; Risse, Stefan; Tünnermann, Andreas

2015-10-01

Ultra-precise metal optics are key components of sophisticated scientific instrumentation in astronomy and space applications, covering a wide spectral range. Especially for applications in the visible or ultra-violet spectral ranges, a low roughness of the optics is required. Therefore, a polishable surface is necessary. State of the art is an amorphous nickel-phosphorus (NiP) layer, which enables several polishing techniques achieving a roughness of <1 nm RMS. Typically, these layers are approximately 30 μm to 60 μm thick. Deposited on Al6061, the bimetallic effect leads to a restricted operational temperature, caused by different coefficients of thermal expansion of Al6061 and NiP. Thinner NiP layers reduce the bimetallic effect. Hence, the possible operating temperature range. A deterministic shape correction via Magnetorheological Finishing of the substrate Al6061 leads to low shape deviations prior to the NiP deposition. This allows for depositing thin NiP-layers, which are polishable via a chemical mechanical polishing technique aiming at ultra-precise metal optics. The present article shows deposition processes and polishability of electroless and electrolytic NiP layers with thicknesses between 1 μm and 10 μm.

Stress polishing demonstrator for ELT M1 segments and industrialization

NASA Astrophysics Data System (ADS)

Hugot, Emmanuel; Bernard, Anaïs.; Laslandes, Marie; Floriot, Johan; Dufour, Thibaut; Fappani, Denis; Combes, Jean Marc; Ferrari, Marc

2014-07-01

After two years of research and development under ESO support, LAM and Thales SESO present the results of their experiment for the fast and accurate polishing under stress of ELT 1.5 meter segments as well as the industrialization approach for mass production. Based on stress polishing, this manufacturing method requires the conception of a warping harness able to generate extremely accurate bending of the optical surface of the segments during the polishing. The conception of the warping harness is based on finite element analysis and allowed a fine tuning of each geometrical parameter of the system in order to fit an error budget of 25nm RMS over 300μm of bending peak to valley. The optimisation approach uses the simulated influence functions to extract the system eigenmodes and characterise the performance. The same approach is used for the full characterisation of the system itself. The warping harness has been manufactured, integrated and assembled with the Zerodur 1.5 meter segment on the LAM 2.5meter POLARIS polishing facility. The experiment consists in a cross check of optical and mechanical measurements of the mirrors bending in order to develop a blind process, ie to bypass the optical measurement during the final industrial process. This article describes the optical and mechanical measurements, the influence functions and eigenmodes of the system and the full performance characterisation of the warping harness.

Graphite Composite Panel Polishing Fixture

NASA Technical Reports Server (NTRS)

Hagopian, John; Strojny, Carl; Budinoff, Jason

2011-01-01

The use of high-strength, lightweight composites for the fixture is the novel feature of this innovation. The main advantage is the light weight and high stiffness-to-mass ratio relative to aluminum. Meter-class optics require support during the grinding/polishing process with large tools. The use of aluminum as a polishing fixture is standard, with pitch providing a compliant layer to allow support without deformation. Unfortunately, with meter-scale optics, a meter-scale fixture weighs over 120 lb (.55 kg) and may distort the optics being fabricated by loading the mirror and/or tool used in fabrication. The use of composite structures that are lightweight yet stiff allows standard techniques to be used while providing for a decrease in fixture weight by almost 70 percent. Mounts classically used to support large mirrors during fabrication are especially heavy and difficult to handle. The mount must be especially stiff to avoid deformation during the optical fabrication process, where a very large and heavy lap often can distort the mount and optic being fabricated. If the optic is placed on top of the lapping tool, the weight of the optic and the fixture can distort the lap. Fixtures to support the mirror during fabrication are often very large plates of aluminum, often 2 in. (.5 cm) or more in thickness and weight upwards of 150 lb (68 kg). With the addition of a backing material such as pitch and the mirror itself, the assembly can often weigh over 250 lb (.113 kg) for a meter-class optic. This innovation is the use of a lightweight graphite panel with an aluminum honeycomb core for use as the polishing fixture. These materials have been used in the aerospace industry as structural members due to their light weight and high stiffness. The grinding polishing fixture consists of the graphite composite panel, fittings, and fixtures to allow interface to the polishing machine, and introduction of pitch buttons to support the optic under fabrication. In its operation, the grinding polishing fixture acts as a reaction structure to the polishing tool. It must be stiff enough to avoid imparting a distorted shape to the optic under fabrication and light enough to avoid self-deflection. The fixture must also withstand significant tangential loads from the polishing machine during operations.

Methods for improving the damage performance of fused silica polished by magnetorheological finishing

DOE PAGES

Kafka, Kyle R. P.; Hoffman, Brittany N.; Papernov, Semyon; ...

2017-12-11

The laser-induced damage threshold of fused-silica samples processed via magnetorheological finishing is investigated for polishing compounds depending on the type of abrasive material and the post-polishing surface roughness. The effectiveness of laser conditioning is examined using a ramped pre-exposure with the same 351-nm, 3-ns Gaussian pulses. Lastly, we examine chemical etching of the surface and correlate the resulting damage threshold to the etching protocol. A combination of etching and laser conditioning is found to improve the damage threshold by a factor of ~3, while maintaining <1-nm surface roughness.

Use of chemical mechanical polishing in micromachining

DOEpatents

Nasby, Robert D.; Hetherington, Dale L.; Sniegowski, Jeffry J.; McWhorter, Paul J.; Apblett, Christopher A.

1998-01-01

A process for removing topography effects during fabrication of micromachines. A sacrificial oxide layer is deposited over a level containing functional elements with etched valleys between the elements such that the sacrificial layer has sufficient thickness to fill the valleys and extend in thickness upwards to the extent that the lowest point on the upper surface of the oxide layer is at least as high as the top surface of the functional elements in the covered level. The sacrificial oxide layer is then polished down and planarized by chemical-mechanical polishing. Another layer of functional elements is then formed upon this new planarized surface.

Methods for improving the damage performance of fused silica polished by magnetorheological finishing

NASA Astrophysics Data System (ADS)

Kafka, K. R. P.; Hoffman, B.; Papernov, S.; DeMarco, M. A.; Hall, C.; Marshall, K. L.; Demos, S. G.

2017-12-01

The laser-induced damage threshold of fused-silica samples processed via magnetorheological finishing is investigated for polishing compounds depending on the type of abrasive material and the post-polishing surface roughness. The effectiveness of laser conditioning is examined using a ramped pre-exposure with the same 351-nm, 3-ns Gaussian pulses. Finally, we examine chemical etching of the surface and correlate the resulting damage threshold to the etching protocol. A combination of etching and laser conditioning is found to improve the damage threshold by a factor of 3, while maintaining <1-nm surface roughness.

Development of collagen peptide-based biomaterials for tissue engineering applications

NASA Astrophysics Data System (ADS)

Hernandez Gordillo, Victor

The transition from in vitro to in vivo use of stem cells in regenerative medicine requires biomaterial scaffolds that can maintain stem cell viability and at the same time allow cell differentiation. We have previously reported the design of a collagen mimetic peptide (CMP) that assembles into a mesh-like three-dimensional (3D) structure upon the addition of metal ions and its potential for the culture of human cells. The addition of a chelating solution, such as EDTA, results in disassembly of the 3D structure, demonstrating the flexibility in the assembly/disassembly process. In the second chapter of this dissertation, we report the design of CMPs that can be functionalized with His-tagged cargoes within the 3D scaffold, via metal coordination. We show that the addition of GFP-His8 and human epidermal growth factor (hEGF-His6) has minimal effect in the assembly process. Additionally, we show that the bound hEGF-His6 can be released gradually in vitro for 5 days and induces cell proliferation in an EGF-dependent cell line. Furthermore, we functionalized the CMPs with the cell adhesion sequence (RGDS) to promote cell differentiation of two human non-tumorigenic cells lines, MCF10A and 3522-S1. In the third chapter, we evaluated the possibility of using the collagen mimetic-peptide-based (CMP) scaffolds for cell encapsulation and differentiation of human mesenchymal stem cells (hMSC). We show that hMSC encapsulated within the CMP scaffold are viable for up to 24 days post encapsulation. Moreover, hMSC at days 1, 4 and 8 days after encapsulation can be recovered from the scaffold and retain their stemness properties when analyzed for in vitro differentiation. We also demonstrate by real time PCR (RT-PCR) that genes important for osteogenic and chondrogenic differentiation are over-expressed in the absence of stimulating factors when the cells are encapsulated in the 3D scaffold at 8 and 24 days post encapsulation. Lastly, the incorporation of the cell adhesion sequence (RGDS) was shown to influence the scaffold-cell interaction. hMSCs within these RGDS-modified scaffold adopted spindle shape morphology and a complex cell organization at the outermost layer of the scaffold. In contrast, in the scaffold lacking the RGDS sequence hSMCs formed cell aggregates.

The association between hypertension-specific care management processes and blood pressure outcomes in US-based physician organizations.

PubMed

Wong, Ken; Smalarz, Amy; Wu, Ning; Boulanger, Luke; Wogen, Jenifer

2011-01-01

Care management processes (CMP) may be implemented in health systems to improve chronic disease quality of care. The objective of this study was to assess the relationship between the presence of hypertension-specific CMP and blood pressure (BP) control among hypertensive patients within selected physician organizations in the USA-modified version of the Physician Practice Connection Readiness Survey (PPC-RS), developed by The National Committee for Quality Assurance (NCQA), was administered to chief medical officers at 28 US-based physician organizations in 2010. Hypertension-specific survey items were added to the PPC-RS and focused on medication fill compliance, chronic disease management, and patient self-management. Demographic and clinical cross-sectional data from a random sample of 300 hypertensive patients age 18 years or older were collected at each site. Physician site and patient characteristics were reported. Regression models were used to assess the relationship between hypertension-specific physician practices and patient BP control. Eligible patients had at least a 1-year history of care with the physician organization and had an encounter within the past year of data collection. Of the 28 participating sites, most had electronic medical records that handle total functionality (71.4%) and had more than 50 staff members (78.6%). Across all sites, approximately 61% of patients had controlled BP. Regression analyses found that practices that used physician education as an effort to improve medication fill compliance demonstrated improvement in BP control (changes in systolic BP: beta coefficient = -1.366, P = .034; changes in diastolic BP: beta coefficient = -0.859, P = .056). The use of a systematic process to screen or assess patients for hypertension as a risk factor was also found to be associated with improvements in BP control (changes in diastolic BP: beta coefficient = -0.860, P = .006). In addition, physician practices that maintained a list of hypertensive patients along with the patients' associated clinical data demonstrated better BP control (currently controlled BP: beta coefficient = 0.282, P = .034; currently uncontrolled BP: beta coefficient = -0.292, P = .023). However, use of the following practices had a negative correlation with BP control: case management (changes in systolic BP: beta coefficient 1.649, P = .022; changes in diastolic BP: beta coefficient = 0.910, P = .078), follow-up for missed appointments (changes in systolic BP: beta coefficient = 0.937, P = .041; changes in diastolic BP: beta coefficient = 0.165, P = .627), adopted written evidence-based standards of care to treat hypertension (changes in systolic BP: beta coefficient = 0.985, P = .032; changes in diastolic BP: beta coefficient = 0.346, P = .305), and checklists for tests and interventions (changes in systolic BP: beta coefficient = 1.586, P = .004; changes in diastolic BP: beta coefficient = 0.938, P = .019). Findings from this multisite study provide evidence that the presence of some hypertension-specific CMP in physician organizations may be associated with better BP outcomes among hypertensive patients. In particular, patients may benefit from physician efforts to improve medication fill compliance as well as organizational monitoring of hypertensive patients and their clinical data. Further research is warranted to better assess the relationship between CMP and treatment of chronic diseases such as hypertension over time. Copyright © 2011 American Society of Hypertension. Published by Elsevier Inc. All rights reserved.

Laser polishing of 3D printed mesoscale components

NASA Astrophysics Data System (ADS)

Bhaduri, Debajyoti; Penchev, Pavel; Batal, Afif; Dimov, Stefan; Soo, Sein Leung; Sten, Stella; Harrysson, Urban; Zhang, Zhenxue; Dong, Hanshan

2017-05-01

Laser polishing of various engineered materials such as glass, silica, steel, nickel and titanium alloys, has attracted considerable interest in the last 20 years due to its superior flexibility, operating speed and capability for localised surface treatment compared to conventional mechanical based methods. The paper initially reports results from process optimisation experiments aimed at investigating the influence of laser fluence and pulse overlap parameters on resulting workpiece surface roughness following laser polishing of planar 3D printed stainless steel (SS316L) specimens. A maximum reduction in roughness of over 94% (from ∼3.8 to ∼0.2 μm Sa) was achieved at the optimised settings (fluence of 9 J/cm2 and overlap factors of 95% and 88-91% along beam scanning and step-over directions respectively). Subsequent analysis using both X-ray photoelectron spectroscopy (XPS) and glow discharge optical emission spectroscopy (GDOES) confirmed the presence of surface oxide layers (predominantly consisting of Fe and Cr phases) up to a depth of ∼0.5 μm when laser polishing was performed under normal atmospheric conditions. Conversely, formation of oxide layers was negligible when operating in an inert argon gas environment. The microhardness of the polished specimens was primarily influenced by the input thermal energy, with greater sub-surface hardness (up to ∼60%) recorded in the samples processed with higher energy density. Additionally, all of the polished surfaces were free of the scratch marks, pits, holes, lumps and irregularities that were prevalent on the as-received stainless steel samples. The optimised laser polishing technology was consequently implemented for serial finishing of structured 3D printed mesoscale SS316L components. This led to substantial reductions in areal Sa and St parameters by 75% (0.489-0.126 μm) and 90% (17.71-1.21 μm) respectively, without compromising the geometrical accuracy of the native 3D printed samples.

New method to control form and texture on industrially-sized lenses

NASA Astrophysics Data System (ADS)

Walker, D. D.

2003-05-01

Summary This paper provides a progress-report on the development of the Precessions polishing process. This is a new small-tool polishing technique for producing aspheric forms and correcting spherical forms. Precessions polishing has been developed by Zeeko Ltd in collaboration with the Optical Science Laboratory at University College London and Loh Optikmaschinen. The Zeeko/Loh All machine (see figure below) has a capacity of 200mm diameter, and is targeted at industrial lenses and mirrors. The baseline of the PrecessionsTM process is a sub-diameter physical tool working the surface with a polishing slurry. Position and orientation of the tooling is controlled by a 7-axis CNC polishing machine that has been custom-designed for the purpose. The tool comprises an inflated, bulged, rubber-membrane (the 'bonnet'), covered with one of the usual proprietary flexible polishing surfaces familiar to opticians. The membrane moulds itself around the local asphere, keeping good contact everywhere. It is spun about its axis to give high removal-rates, and attacks the surface of the part working on the side of the bulged surface, rather than the classical pole-down configuration. The contact area and polishing pressure can be varied independently by changing the degree to which the bonnet is compressed, and the internal fluid pressure. The rotation axis is precessed around the local normal to the part, and this averages surface texture and achieves a near-Gaussian tool removal-profile (Influence function'). For axially-symmetric parts, the part is rotated and the tool moved radially, thereby creating a spiral tool-path. An off- line software application analyses i) the surface error-profile, and ii) experimental data on the tool influence functions for different spot-sizes. An iterative numerical optimisation method is then used to compute the dwell-time and spot- size for each zone of the spiral on the surface, to rectify the form error.

The improvement of surface roughness by polishing method of arcylic door panel at Taishi Tech Sdn Bhd

NASA Astrophysics Data System (ADS)

Basirin, Hammadi bin Mohd; Nawi, Ismail bin Haji Mohd

2017-04-01

This research is an approach to improve the surface roughness for acrylic door panel by using polishing process. The polishing process involve is sanding process by 3 types of sand paper. The sanding process used to improve the surface roughness by using the different grit sizes of sand paper. The experiment was done by using two types of material s, that is plywood and medium density board (MDF). These two materials are the main materials in producing the arcrylic door panel. The surface roughness of these two materials affects the qualities and quantities of the acrylic door panel. The surface structure was measured by using Optical Microscope and Scanning Electron Microscope (SEM) and the surface roughness was measured by using Mitutoyo surfest SJ 400 Tester. Results indicates that using the different types of grit are influence the surface roughness of the material. When the higher types of grit sizes had been used, the average roughness of the surface are decrease. In summary, a good surface roughness condition produced when using the higher types of grit sizes sand paper.

Fabrication of nano-scale Cu bond pads with seal design in 3D integration applications.

PubMed

Chen, K N; Tsang, C K; Wu, W W; Lee, S H; Lu, J Q

2011-04-01

A method to fabricate nano-scale Cu bond pads for improving bonding quality in 3D integration applications is reported. The effect of Cu bonding quality on inter-level via structural reliability for 3D integration applications is investigated. We developed a Cu nano-scale-height bond pad structure and fabrication process for improved bonding quality by recessing oxides using a combination of SiO2 CMP process and dilute HF wet etching. In addition, in order to achieve improved wafer-level bonding, we introduced a seal design concept that prevents corrosion and provides extra mechanical support. Demonstrations of these concepts and processes provide the feasibility of reliable nano-scale 3D integration applications.

Insulated InP (100) semiconductor by nano nucleus generation in pure water

NASA Astrophysics Data System (ADS)

Ghorab, Farzaneh; Es'haghi, Zarrin

2018-01-01

Preparation of specified designs on optoelectronic devices such as Light-Emitting Diodes (LEDs) and Laser Diodes (LDs) by using insulated thin films is very important. InP as one of those semiconductors which is used as optoelectronic devices, have two different kinds of charge carriers as n-InP and p-InP in the microelectronic industry. The surface preparation of this kind of semiconductor can be accomplished with individually chemical, mechanical, chemo - mechanical and electrochemical methods. But electrochemical method can be suitably replaced instead of the other methods, like CMP (Chemical Mechanical Polishing), because of the simplicity. In this way, electrochemically formation of insulated thin films by nano nucleus generation on semiconductor (using constant current density of 0.07 mA /cm2) studied in this research. Insulated nano nucleus generation and their growth up to thin film formation on semiconductor single crystal (100), n-InP, inpure water (0.08 µs/cm,25°c) characterized by Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), Four-point probe and Styloprofilometer techniques. The SEM images show active and passive regions on the n-InP surface and not uniform area on p-InP surface by passing through the passive condition. So the passive regions were nonuniform, and only the active regions were uniform and clean. The various semiconducting behavior in electrochemical condition, studied and compared with structural specification of InP type group (III-V).

Polishing aspheric mirrors of zero-thermal expansion cordierite ceramics (NEXCERA) for space telescope

NASA Astrophysics Data System (ADS)

Sugawara, Jun; Kamiya, Tomohiro; Mikashima, Bumpei

2017-09-01

Ultra-low thermal expansion ceramics NEXCERATM is regarded as one of potential candidate materials crucial for ultralightweight and thermally-stable optical mirrors for space telescopes which are used in future optical missions satisfying extremely high observation specifications. To realize the high precision NEXCERA mirrors for space telescopes, it is important to develop a deterministic aspheric shape polishing and a precise figure correction polishing method for the NEXCERA. Magnetorheological finishing (MRF) was tested to the NEXCERA aspheric mirror from best fit sphere shape, because the MRF technology is regarded as the best suited process for a precise figure correction of the ultralightweight mirror with thin sheet due to its advantage of low normal force polishing. As using the best combination of material and MR fluid, the MRF was performed high precision figure correction and to induce a hyperbolic shape from a conventionally polished 100mm diameter sphere, and achieved the sufficient high figure accuracy and the high quality surface roughness. In order to apply the NEXCERA to a large scale space mirror, for the next step, a middle size solid mirror, 250 mm diameter concave parabola, was machined. It was roughly ground in the parabolic shape, and was lapped and polished by a computer-controlled polishing machine using sub-aperture polishing tools. It resulted in the smooth surface of 0.6 nm RMS and the figure accuracy of λ/4, being enough as pre-MRF surface. A further study of the NEXCERA space mirrors should be proceeded as a figure correction using the MRF to lightweight mirror with thin mirror sheet.

Impact of initial surface parameters on the final quality of laser micro-polished surfaces

NASA Astrophysics Data System (ADS)

Chow, Michael; Bordatchev, Evgueni V.; Knopf, George K.

2012-03-01

Laser micro-polishing (LμP) is a new laser-based microfabrication technology for improving surface quality during a finishing operation and for producing parts and surfaces with near-optical surface quality. The LμP process uses low power laser energy to melt a thin layer of material on the previously machined surface. The polishing effect is achieved as the molten material in the laser-material interaction zone flows from the elevated regions to the local minimum due to surface tension. This flow of molten material then forms a thin ultra-smooth layer on the top surface. The LμP is a complex thermo-dynamic process where the melting, flow and redistribution of molten material is significantly influenced by a variety of process parameters related to the laser, the travel motions and the material. The goal of this study is to analyze the impact of initial surface parameters on the final surface quality. Ball-end micromilling was used for preparing initial surface of samples from H13 tool steel that were polished using a Q-switched Nd:YAG laser. The height and width of micromilled scallops (waviness) were identified as dominant parameter affecting the quality of the LμPed surface. By adjusting process parameters, the Ra value of a surface, having a waviness period of 33 μm and a peak-to-valley value of 5.9 μm, was reduced from 499 nm to 301 nm, improving the final surface quality by 39.7%.

Material removal characteristics of orthogonal velocity polishing tool for efficient fabrication of CVD SiC mirror surfaces

NASA Astrophysics Data System (ADS)

Seo, Hyunju; Han, Jeong-Yeol; Kim, Sug-Whan; Seong, Sehyun; Yoon, Siyoung; Lee, Kyungmook; Lee, Haengbok

2015-09-01

Today, CVD SiC mirrors are readily available in the market. However, it is well known to the community that the key surface fabrication processes and, in particular, the material removal characteristics of the CVD SiC mirror surface varies sensitively depending on the shop floor polishing and figuring variables. We investigated the material removal characteristics of CVD SiC mirror surfaces using a new and patented polishing tool called orthogonal velocity tool (OVT) that employs two orthogonal velocity fields generated simultaneously during polishing and figuring machine runs. We built an in-house OVT machine and its operating principle allows for generation of pseudo Gaussian shapes of material removal from the target surface. The shapes are very similar to the tool influence functions (TIFs) of other polishing machine such as IRP series polishing machines from Zeeko. Using two CVD SiC mirrors of 150 mm in diameter and flat surface, we ran trial material removal experiments over the machine run parameter ranges from 12.901 to 25.867 psi in pressure, 0.086 m/sec to 0.147 m/sec in tool linear velocity, and 5 to 15 sec in dwell time. An in-house developed data analysis program was used to obtain a number of Gaussian shaped TIFs and the resulting material removal coefficient varies from 3.35 to 9.46 um/psi hour m/sec with the mean value to 5.90 ± 1.26(standard deviation). We report the technical details of the new OVT machine, of the data analysis program, of the experiments and the results together with the implications to the future development of the OVT machine and process for large CVD SiC mirror surfaces.

Effect of magnetization boundary condition on cavity magnon polariton of YIG thin film.

PubMed

Jiang, H H; Xiao, Y; Hu, C M; Guo, H; Xia, K

2018-06-22

Motivated by recent studies of cavity magnon polariton (CMP), we extended a previous theoretical work to generalize microwave transmission calculation with various magnetization boundary condition of YIG thin film embedded in cavity. It is found that numerical implementation given in this paper can be easily applied to other magnetization boundary condition and extended to magnetic multilayers. Numerical results show that ferromagnetic resonance mode of microwave transmission spectrum, which is absent in previous calculation, can be recovered by altering the pinning condition of surface spins. The demonstrated reliability of our theory opens attractive perspectives for studying CMP of thin film with complicated surface magnetization distribution and magnetic multilayers.

Investigation of the binding between pepsin and nucleoside analogs by spectroscopy and molecular simulation.

PubMed

Li, Zhen; Li, Zhigang; Yang, Lingling; Xie, Yuanzhe; Shi, Jie; Wang, Ruiyong; Chang, Junbiao

2015-03-01

In this paper, the interactions of pepsin with CYD (cytidine) or nucleoside analogs, including FNC (2'-deoxy-2'-β-fluoro-4'-azidocytidine) and CMP (cytidine monophosphate), were investigated by fluorescence, UV-visible absorption and synchronous fluorescence spectroscopy under mimic physiological conditions. The results indicated that FNC (CYD/CMP) caused the fluorescence quenching by the formation of complex. The binding constants and thermo-dynamic parameters at three different temperatures were obtained. The hydrophobic and electrostatic interactions were the predominant intermolecular forces to stabilize the complex. The F atom in FNC might weaken the binding of nucleoside analog to pepsin. Results showed that CYD was the strongest quencher and bound to pepsin with higher affinity.