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Sample records for polycrystalline si thin

  1. Effect of flash lamp annealing on electrical activation in boron-implanted polycrystalline Si thin films

    SciTech Connect

    Do, Woori; Jin, Won-Beom; Choi, Jungwan; Bae, Seung-Muk; Kim, Hyoung-June; Kim, Byung-Kuk; Park, Seungho; Hwang, Jin-Ha

    2014-10-15

    Highlights: • Intensified visible light irradiation was generated via a high-powered Xe arc lamp. • The disordered Si atomic structure absorbs the intensified visible light. • The rapid heating activates electrically boron-implanted Si thin films. • Flash lamp heating is applicable to low temperature polycrystalline Si thin films. - Abstract: Boron-implanted polycrystalline Si thin films on glass substrates were subjected to a short duration (1 ms) of intense visible light irradiation generated via a high-powered Xe arc lamp. The disordered Si atomic structure absorbs the intense visible light resulting from flash lamp annealing. The subsequent rapid heating results in the electrical activation of boron-implanted Si thin films, which is empirically observed using Hall measurements. The electrical activation is verified by the observed increase in the crystalline component of the Si structures resulting in higher transmittance. The feasibility of flash lamp annealing has also been demonstrated via a theoretical thermal prediction, indicating that the flash lamp annealing is applicable to low-temperature polycrystalline Si thin films.

  2. Polycrystalline Mg{sub 2}Si thin films: A theoretical investigation of their electronic transport properties

    SciTech Connect

    Balout, H.; Boulet, P.; Record, M.-C.

    2015-05-15

    The electronic structures and thermoelectric properties of a polycrystalline Mg{sub 2}Si thin film have been investigated by first-principle density-functional theory (DFT) and Boltzmann transport theory calculations within the constant-relaxation time approximation. The polycrystalline thin film has been simulated by assembling three types of slabs each having the orientation (001), (110) or (111) with a thickness of about 18 Å. The effect of applying the relaxation procedure to the thin film induces disorder in the structure that has been ascertained by calculating radial distribution functions. For the calculations of the thermoelectric properties, the energy gap has been fixed at the experimental value of 0.74 eV. The thermoelectric properties, namely the Seebeck coefficient, the electrical conductivity and the power factor, have been determined at three temperatures of 350 K, 600 K and 900 K with respect to both the energy levels and the p-type and n-type doping levels. The best Seebeck coefficient is obtained at 350 K: the S{sub yy} component of the tensor amounts to about ±1000 μV K{sup −1}, depending on the type of charge carriers. However, the electrical conductivity is much too small which results in low values of the figure of merit ZT. Structure–property relationship correlations based on directional radial distribution functions allow us to tentatively draw some explanations regarding the anisotropy of the electrical conductivity. Finally, the low ZT values obtained for the polycrystalline Mg{sub 2}Si thin film are paralleled with those recently reported in the literature for bulk chalcogenide glasses. - Graphical abstract: Structure of the polycrystalline thin film of Mg{sub 2}Si. - Author-Highlights: • Polycrystalline Mg{sub 2}Si film has been modelled by DFT approach. • Thermoelectric properties have been evaluated by semi-classical Boltzmann theory. • The structure was found to be slightly disordered after relaxation. • The highest

  3. Ambient condition laser writing of graphene structures on polycrystalline SiC thin film deposited on Si wafer

    SciTech Connect

    Yue, Naili; Zhang, Yong; Tsu, Raphael

    2013-02-18

    We report laser induced local conversion of polycrystalline SiC thin-films grown on Si wafers into multi-layer graphene, a process compatible with the Si based microelectronic technologies. The conversion can be achieved using a 532 nm CW laser with as little as 10 mW power, yielding {approx}1 {mu}m graphene discs without any mask. The conversion conditions are found to vary with the crystallinity of the film. More interestingly, the internal structure of the graphene disc, probed by Raman imaging, can be tuned with varying the film and illumination parameters, resembling either the fundamental or doughnut mode of a laser beam.

  4. Ambient condition laser writing of graphene structures on polycrystalline SiC thin film deposited on Si wafer

    NASA Astrophysics Data System (ADS)

    Yue, Naili; Zhang, Yong; Tsu, Raphael

    2013-02-01

    We report laser induced local conversion of polycrystalline SiC thin-films grown on Si wafers into multi-layer graphene, a process compatible with the Si based microelectronic technologies. The conversion can be achieved using a 532 nm CW laser with as little as 10 mW power, yielding ˜1 μm graphene discs without any mask. The conversion conditions are found to vary with the crystallinity of the film. More interestingly, the internal structure of the graphene disc, probed by Raman imaging, can be tuned with varying the film and illumination parameters, resembling either the fundamental or doughnut mode of a laser beam.

  5. Magnetoresistance in polycrystalline and epitaxial Fe1-xCoxSi thin films

    NASA Astrophysics Data System (ADS)

    Porter, N. A.; Creeth, G. L.; Marrows, C. H.

    2012-08-01

    Thin films of Fe1-xCoxSi were grown using molecular beam epitaxy on Si(111). These 20-nm-thick films, with compositions x=0 or 0.5, were produced by two methods: the first produced large (111)-textured crystallites of the B20 phase; the second produced phase-pure B20 (111) epilayers. The lattice mismatch with the substrate causes biaxial tensile strain in the layers, greater in the epilayers, that distorts the (111)-oriented material to a rhombohedral form. Magnetotransport measurements show that a combination of additional scattering arising from crystal grain boundaries and strain-free polycrystalline films results in a higher resistivity than for the epitaxial films. Magnetometry for x=0.5 suggests an increase in the ordering temperature in strained films relative to the polycrystalline films of 15±4 K. Moreover, the characteristic linear magnetoresistance, typical of bulk single-crystal material of this composition, is retained in the polycrystalline film but reduced in the epitaxial film. While the bulk properties of these materials are reproduced qualitatively, there are small quantitative modifications, due to the strain, to properties such as band gap, Curie temperature, and magnetoresistance.

  6. Transient and End Silicide Phase Formation in Thin Film Ni/polycrystalline-Si Reactions for Fully Silicided Gate Applications

    SciTech Connect

    Kittl,J.; Pawlak, M.; Torregiani, C.; Lauwers, A.; Demeurisse, C.; Vrancken, C.; Absil, P.; Biesemans, S.; Coia, C.; et. al

    2007-01-01

    The Ni/polycrystalline-Si thin film reaction was monitored by in situ x-ray diffraction during ramp annealings, obtaining a detailed view of the formation and evolution of silicide phases in stacks of interest for fully silicided gate applications. Samples consisted of Ni (30-170 nm)/polycrystalline-Si (100 nm)/SiO2 (10-30 nm) stacks deposited on (100) Si. The dominant end phase (after full silicidation) was found to be well controlled by the deposited Ni to polycrystalline-Si thickness ratio (tNi/tSi), with formation of NiSi2 ( {approx} 600 C), NiSi ( {approx} 400 C), Ni3Si2 ( {approx} 500 C), Ni2Si, Ni31Si12 ( {approx} 420 C), and Ni3Si ( {approx} 600 C) in stacks with tNi/tSi of 0.3, 0.6, 0.9, 1.2, 1.4, and 1.7, respectively. NiSi and Ni31Si12 were observed to precede formation of NiSi2 and Ni3Si, respectively, as expected for the phase sequence conventionally reported. Formation of Ni2Si was observed at early stages of the reaction. These studies revealed, in addition, the formation of transient phases that appeared and disappeared in narrow temperature ranges, competing with formation of the phases expected in the conventional phase sequence. These included the transient formation of NiSi and Ni31Si12 in stacks in which these phases are not expected to form (e.g., tNi/tSi of 1.7 and 0.9, respectively), at temperatures similar to those in which these phases normally grow.

  7. On the Discontinuity of Polycrystalline Silicon Thin Films Realized by Aluminum-Induced Crystallization of PECVD-Deposited Amorphous Si

    NASA Astrophysics Data System (ADS)

    Pan, Qingtao; Wang, Tao; Yan, Hui; Zhang, Ming; Mai, Yaohua

    2017-04-01

    Crystallization of glass/Aluminum (50, 100, 200 nm) /hydrogenated amorphous silicon (a-Si:H) (50, 100, 200 nm) samples by Aluminum-induced crystallization (AIC) is investigated in this article. After annealing and wet etching, we found that the continuity of the polycrystalline silicon (poly-Si) thin films was strongly dependent on the double layer thicknesses. Increasing the a-Si:H/Al layer thickness ratio would improve the film microcosmic continuity. However, too thick Si layer might cause convex or peeling off during annealing. Scanning electron microscopy (SEM) and Energy Dispersive X-ray spectroscopy (EDX) are introduced to analyze the process of the peeling off. When the thickness ratio of a-Si:H/Al layer is around 1 to 1.5 and a-Si:H layer is less than 200 nm, the poly-Si film has a good continuity. Hall measurements are introduced to determine the electrical properties. Raman spectroscopy and X-ray diffraction (XRD) results show that the poly-Si film is completely crystallized and has a preferential (111) orientation.

  8. On the Discontinuity of Polycrystalline Silicon Thin Films Realized by Aluminum-Induced Crystallization of PECVD-Deposited Amorphous Si

    NASA Astrophysics Data System (ADS)

    Pan, Qingtao; Wang, Tao; Yan, Hui; Zhang, Ming; Mai, Yaohua

    2017-01-01

    Crystallization of glass/Aluminum (50, 100, 200 nm) /hydrogenated amorphous silicon (a-Si:H) (50, 100, 200 nm) samples by Aluminum-induced crystallization (AIC) is investigated in this article. After annealing and wet etching, we found that the continuity of the polycrystalline silicon (poly-Si) thin films was strongly dependent on the double layer thicknesses. Increasing the a-Si:H/Al layer thickness ratio would improve the film microcosmic continuity. However, too thick Si layer might cause convex or peeling off during annealing. Scanning electron microscopy (SEM) and Energy Dispersive X-ray spectroscopy (EDX) are introduced to analyze the process of the peeling off. When the thickness ratio of a-Si:H/Al layer is around 1 to 1.5 and a-Si:H layer is less than 200 nm, the poly-Si film has a good continuity. Hall measurements are introduced to determine the electrical properties. Raman spectroscopy and X-ray diffraction (XRD) results show that the poly-Si film is completely crystallized and has a preferential (111) orientation.

  9. Preparation of translucent Gd2Si2O7:Ce polycrystalline thin plates and their scintillation performance for α-particles

    NASA Astrophysics Data System (ADS)

    Nishikata, Mami; Ueda, Aki; Higuchi, Mikio; Kaneko, Junichi H.; Tsubota, Youichi; Ishibashi, Hiroyuki

    2015-07-01

    Translucent Gd2Si2O7:Ce (GPS:Ce) polycrystalline plates were prepared via liquid-phase sintering using SiO2 as a self-flux, and their scintillation performances for α-particles were investigated. Dense sintered compacts comprising large grains, some of which were larger than 100 μm in diameter, were successfully prepared by sintering at 1690 °C for 100 h. The best result was obtained with the powder comprising only <40 μm particles. Any combination of powders of <40 μm and <15 μm resulted in inhomogeneous structures with smaller grains of about 50 μm. A translucent GPS:Ce thin plate was fabricated by grinding the sintered compact that contained excess SiO2 of 8 mol%. Since the plate was composed of large grains, scattering at the grain boundaries was effectively suppressed and many of the grains virtually act as single crystals when the plate thickness was less than 100 μm. Therefore, the decrease in the plate thickness brought increase in the total transmission, and light yield and energy resolution were consequently improved. When the plate thickness was 50 μm, light yield was 82% as compared with that of a GPS:Ce single crystal as a reference, and energy resolution attained to 13%.

  10. Polycrystalline-thin-film thermophotovoltaic cells

    NASA Astrophysics Data System (ADS)

    Dhere, Neelkanth G.

    1996-02-01

    Thermophotovoltaic (TPV) cells convert thermal energy to electricity. Modularity, portability, silent operation, absence of moving parts, reduced air pollution, rapid start-up, high power densities, potentially high conversion efficiencies, choice of a wide range of heat sources employing fossil fuels, biomass, and even solar radiation are key advantages of TPV cells in comparison with fuel cells, thermionic and thermoelectric convertors, and heat engines. The potential applications of TPV systems include: remote electricity supplies, transportation, co-generation, electric-grid independent appliances, and space, aerospace, and military power applications. The range of bandgaps for achieving high conversion efficiencies using low temperature (1000-2000 K) black-body or selective radiators is in the 0.5-0.75 eV range. Present high efficiency convertors are based on single crystalline materials such as In1-xGaxAs, GaSb, and Ga1-xInxSb. Several polycrystalline thin films such as Hg1-xCdxTe, Sn1-xCd2xTe2, and Pb1-xCdxTe, etc., have great potential for economic large-scale applications. A small fraction of the high concentration of charge carriers generated at high fluences effectively saturates the large density of defects in polycrystalline thin films. Photovoltaic conversion efficiencies of polycrystalline thin films and PV solar cells are comparable to single crystalline Si solar cells, e.g., 17.1% for CuIn1-xGaxSe2 and 15.8% for CdTe. The best recombination-state density Nt is in the range of 10-15-10-16 cm-3 acceptable for TPV applications. Higher efficiencies may be achieved because of the higher fluences, possibility of bandgap tailoring, and use of selective emitters such as rare earth oxides (erbia, holmia, yttria) and rare earth-yttrium aluminium garnets. As compared to higher bandgap semiconductors such as CdTe, it is easier to dope the lower bandgap semiconductors. TPV cell development can benefit from the more mature PV solar cell and opto

  11. Surface Engineering of Polycrystalline Silicon for Long-term Mechanical Stress Endurance Enhancement in Flexible Low Temperature Poly-Si Thin-Film Transistors.

    PubMed

    Chen, Bo-Wei; Chang, Ting-Chang; Hung, Yu-Ju; Huang, Shin-Ping; Chen, Hua-Mao; Liao, Po-Yung; Lin, Yu-Ho; Huang, Hui-Chun; Chiang, Hsiao-Cheng; Yang, Chung-I; Zheng, Yu-Zhe; Chu, Ann-Kuo; Li, Hung-Wei; Tsai, Chih-Hung; Lu, Hsueh-Hsing; Wang, Terry Tai-Jui; Chang, Tsu-Chiang

    2017-02-08

    Surface morphology in polycrystalline silicon (poly-Si) film is an issue regardless of whether conventional excimer laser annealing (ELA) or the newer metal-induced lateral crystallization (MILC) process is used. This paper investigates the stress distribution while undergoing long-term mechanical stress and the influence of stress on electrical characteristics. Our simulated results show that the non-uniform stress in the gate insulator is more pronounced near the polysilicon/gate insulator edge and at the two sides of the polysilicon protrusion. This stress results in defects in the gate insulator and leads to a non-uniform degradation phenomenon, which affects both the performance and reliability in thin-film transistors (TFTs). The degree of degradation is similar regardless of bending axis (channel-length axis, channel-width axis) or bending type (compression, tension), which means that the degradation is dominated by the protrusion effects. Furthermore, by utilizing long-term electrical bias stresses after undergoing long-tern bending stress, it is apparent that the carrier injection is severe in the sub-channel region, which confirms that the influence of protrusions is crucial. To eliminate the influence of surface morphology in poly-Si, three kinds of laser energy density were used during crystallization to control the protrusion height. The device with lowest protrusions demonstrates the smallest degradation after undergoing long-term bending.

  12. Polycrystalline silicon conductivity modulated thin film transistors

    NASA Astrophysics Data System (ADS)

    Anish, Kumar K. P.

    1997-09-01

    Polycrystalline silicon (poly-Si) thin-film transistors (TFTs) on glass has received significant attention for use in large area microelectronic applications. These applications include both niche and large volume applications such as printer drivers, image scanners, active-matrix liquid crystal displays (AMLCDs), electro-luminescent displays, plasma assisted displays, etc. Currently, the leading technology for these applications is amorphous-Si (a-Si) TFT. However, as the information content increases, a-Si technology encounters severe challenges due to its inherent low mobility, high parasitic capacitance, low aperture ratio, and non-compatibility to CMOS process. On the other hand, poly-Si technology offers high mobility, low parasitic capacitance, small size, CMOS compatibility, good stability, and uses the infrastructure of silicon science and technology. Thus, a simple low temperature poly-Si technology which allows large area system integration on panel will be in great demand for future high definition displays. However, it was found that poly-Si material properties vary with its method of preparation, its grain size, its surface roughness, and the nature and distribution of the inter-granular and bulk defects. Therefore, extensive studies are needed to optimize the key parameters such as the off-current, on-current, and breakdown voltage of the devices. These parameters can be optimized by means of material preparation as well as innovative device designs. In this thesis, three TFT structures were invented and fabricated using a simple low temperature poly-Si technology. With these novel structures, pixels, pixel drivers, and analog and digital peripheral circuits can all be built on the same glass substrate. This allows the ultimate goal of display systems on glass to be much more closer to reality. First, a high voltage transistor called the Conductivity Modulated Thin Film Transistor (CMTFT) is presented. Using this structure, the fundamental current

  13. Effect of growth parameters on the structure and magnetic properties of thin polycrystalline Fe films fabricated on Si<1 0 0> substrates

    NASA Astrophysics Data System (ADS)

    Javed, A.; Morley, N. A.; Gibbs, M. R. J.

    2011-04-01

    This paper deals with the experimental investigation of the structure and magnetic properties of thin polycrystalline Fe films. Two sets of 50 ± 2 nm thick Fe films were fabricated on Si<1 0 0> substrates with native oxides in place by varying (i) the sputter pressure pAr and (ii) the Fe sputter power PFe. X-ray diffraction (XRD) study revealed that all films grew with strong <1 1 0> texture normal to the film plane. No higher order peaks were observed in any of the films studied. For both film sets, the lattice constant (a) was less than the bulk Fe lattice constant (a0 = 2.866 Å), which suggested the existence of compressive strain in all films. Two regions of homogeneous strain were observed over the range of pAr studied. Magneto-optical Kerr effect (MOKE) measurements showed that all films exhibited magnetically isotropic behaviour. The magnetic properties were observed to be influenced strongly by pAr. The film grown at pAr = 4 μbar was the most softest (Hs = 100 ± 8 kA m-1, Mr/Ms = 0.87 ± 0.02) film among all the films studied. The magnetic properties were found to be independent of PFe. The effective saturation magnetostriction constant λeff determined (using the Villari method) was positive (4 ± 1 ppm) and observed to vary within the calculated error.

  14. Polycrystalline Thin-Film Photovoltaic Technologies: Progress and Technical Issues

    SciTech Connect

    Ullal, H. S.

    2004-08-01

    Polycrystalline thin-film materials based on copper indium diselenide (CuInSe2, CIS) and cadmium telluride (CdTe) are promising thin-film solar cells for various power and specialty applications. Impressive results have been obtained in the past few years for both thin-film copper indium gallium diselenide (CIGS) solar cells and thin-film CdTe solar cells. NCPV/NREL scientists have achieved world-record, total-area efficiencies of 19.3% for a thin-film CIGS solar cell and 16.5% for thin-film CdTe solar cell. A number of technical R&D issues related to CIS and CdTe have been identified. Thin-film power module efficiencies up to 13.4% has been achieved thus far. Tremendous progress has been made in the technology development for module fabrication, and multi-megawatt manufacturing facilities are coming on line with expansion plans in the next few years. Several 40-480 kW polycrystalline thin-film, grid-connected PV arrays have been deployed worldwide. Hot and humid testing is also under way to validate the long-term reliability of these emerging thin-film power products. The U.S. thin-film production (amorphous silicon[a-Si], CIS, CdTe) is expected to exceed 50 MW by the end of 2005.

  15. Si nanotubes and nanospheres with two-dimensional polycrystalline walls.

    PubMed

    Castrucci, Paola; Diociaiuti, Marco; Tank, Chiti Manohar; Casciardi, Stefano; Tombolini, Francesca; Scarselli, Manuela; De Crescenzi, Maurizio; Mathe, Vikas Laxman; Bhoraskar, Sudha Vasant

    2012-08-21

    We report on the characteristics of a new class of Si-based nanotubes and spherical nanoparticles synthesized by the dc-arc plasma method in a mixture of argon and hydrogen. These two nanostructures share common properties: they are hollow and possess very thin, highly polycrystalline and mainly oxidized walls. In particular, we get several hints indicating that their walls could constitute only one single Si oxidized layer. Moreover, we find that only the less oxidized nanotubes exhibit locally atomic ordered, snakeskin-like areas which possess a hexagonal arrangement which can be interpreted either as an sp(2) or sp(3) hybridized Si or Si-H layer. Their ability to not react with oxygen seems to suggest the presence of sp(2) configuration or the formation of silicon-hydrogen bonding.

  16. Modeling of polycrystalline thin film solar cells

    NASA Astrophysics Data System (ADS)

    Fahrenbruch, Alan L.

    1999-03-01

    This paper describes modeling polycrystalline thin-film solar cells using the program AMPS-1D1 to visualize the relationships between the many variables involved. These simulations are steps toward two dimensional modeling the effects of grain boundaries in polycrystalline cells. Although this paper describes results for the CdS/CdTe cell, the ideas presented here are applicable to copper-indium-gallium selenide (CIGS) cells as well as other types of cells. Results of these one-dimensional simulations are presented: (a) the duplication of experimentally observed cell parameters, (b) the effects of back-contact potential barrier height and its relation to stressing the cell, (c) the effects of the depletion layer width in the CdTe layer on cell parameters, and (d) the effects of CdS layer thickness on the cell parameters. Experience using the software is also described.

  17. Hydrogen passivation of polycrystalline silicon thin films

    NASA Astrophysics Data System (ADS)

    Scheller, L.-P.; Weizman, M.; Simon, P.; Fehr, M.; Nickel, N. H.

    2012-09-01

    The influence of post-hydrogenation on the electrical and optical properties of solid phase crystallized polycrystalline silicon (poly-Si) was examined. The passivation of grain-boundary defects was measured as a function of the passivation time. The silicon dangling-bond concentration decreases with increasing passivation time due to the formation of Si-H complexes. In addition, large H-stabilized platelet-like clusters are generated. The influence of H on the electrical properties was investigated using temperature dependent conductivity and Hall-effect measurements. For poly-Si on Corning glass, the dark conductivity decreases upon hydrogenation, while it increases when the samples are fabricated on silicon-nitride covered Borofloat glass. Hall-effect measurements reveal that for poly-Si on Corning glass the hole concentration and the mobility decrease upon post-hydrogenation, while a pronounced increase is observed for poly-Si on silicon-nitride covered Borofloat glass. This indicates the formation of localized states in the band gap, which is supported by sub band-gap absorption measurments. The results are discussed in terms of hydrogen-induced defect passivation and generation mechanisms.

  18. Progress in polycrystalline thin-film solar cells

    SciTech Connect

    Zweibel, K; Hermann, A; Mitchell, R

    1983-07-01

    Photovoltaic devices based on several polycrystalline thin-film materials have reached near and above 10% sunlight-to-electricity conversion efficiencies. This paper examines the various polycrystalline thin-film PV materials including CuInSe/sub 2/ and CdTe in terms of their material properties, fabrication techniques, problems, and potentials.

  19. Polycrystalline Thin-Film Research: Cadmium Telluride (Fact Sheet)

    SciTech Connect

    Not Available

    2013-06-01

    This National Center for Photovoltaics sheet describes the capabilities of its polycrystalline thin-film research in the area of cadmium telluride. The scope and core competencies and capabilities are discussed.

  20. Polycrystalline Thin-Film Research: Cadmium Telluride (Fact Sheet)

    SciTech Connect

    Not Available

    2011-06-01

    Capabilities fact sheet that includes scope, core competencies and capabilities, and contact/web information for Polycrystalline Thin-Film Research: Cadmium Telluride at the National Center for Photovoltaics.

  1. Formation of porous grain boundaries in polycrystalline silicon thin films

    NASA Astrophysics Data System (ADS)

    Kageyama, Yasuyuki; Murase, Yoshie; Tsuchiya, Toshiyuki; Funabashi, Hirofumi; Sakata, Jiro

    2002-06-01

    Unique polycrystalline silicon (poly-Si) thin films, which were permeable to a concentrated hydrofluoric acid solution through their porous grain boundaries, were investigated to elucidate the formation mechanism of their microstructure. 0.1-μm-thick permeable poly-Si thin films were made through processes of amorphous silicon film formation by low pressure chemical vapor deposition, successive postannealing for crystallization, and excess phosphorus diffusion by a phosphorus oxichloride predeposition. At the grain boundaries, porous microstructures were formed after the films were cleaned in an SC1 solution (a 1:1:5 mixture of NH4OH:H2O2:H2O at 80 °C for 10 min), whereas segregated soluble precipitates observed by a field emission secondary electron microscope were present before the SC1 cleaning. Auger electron microscope revealed that the surface of the precipitates mainly consist of silicon (˜80 at. %) and oxygen (˜20 at. %). As a result of transmission electron microscope observation, it is concluded that enhancement of silicon atom mobility by the phosphorus doping process induced consequent segregation of the soluble precipitates at the grain boundaries.

  2. Polycrystalline thin film materials and devices

    NASA Astrophysics Data System (ADS)

    Baron, B. N.; Birkmire, R. W.; Phillips, J. E.; Shafarman, W. N.; Hegedus, S. S.; McCandless, B. E.

    1991-11-01

    Results and conclusions of Phase 1 of a multi-year research program on polycrystalline thin film solar cells are presented. The research comprised investigation of the relationships among processing, materials properties and device performance of both CuInSe2 and CdTe solar cells. The kinetics of the formation of CuInSe2 by selenization with hydrogen selenide was investigated and a CuInSe2/Cds solar cell was fabricated. An alternative process involving the reaction of deposited copper-indium-selenium layers was used to obtain single phase CuInSe2 films and a cell efficiency of 7 percent. Detailed investigations of the open circuit voltage of CuInSe2 solar cells showed that a simple Shockley-Read-Hall recombination mechanism can not account for the limitations in open circuit voltage. Examination of the influence of CuInSe2 thickness on cell performance indicated that the back contact behavior has a significant effect when the CuInSe2 is less than 1 micron thick. CdTe/CdS solar cells with efficiencies approaching 10 percent can be repeatedly fabricated using physical vapor deposition and serial post deposition processing. The absence of moisture during post deposition was found to be critical. Improvements in short circuit current of CdTe solar cells to levels approaching 25 mA/cm(exp 2) are achievable by making the CdS window layer thinner. Further reductions in the CdS window layer thickness are presently limited by interdiffusion between the CdS and the CdTe. CdTe/CdS cells stored without protection from the atmosphere were found to degrade. The degradation was attributed to the metal contact. CdTe cells with ZnTe:Cu contacts to the CdTe were found to be more stable than cells with metal contacts. Analysis of current-voltage and spectral response of CdTe/CdS cells indicates the cell operates as a p-n heterojunction with the diode current dominated by SRH recombination in the junction region of the CdTe.

  3. RESEARCH ON THIN FILM POLYCRYSTALLINE SOLAR CELLS.

    DTIC Science & Technology

    Studies of factors affecting the properties of polycrystalline CdTe film grown by the vapor reaction process are discussed and a variety of...molybdenum substrates are compared. No real differences are found. Rough measures of temperature effects and tellurium flow rate on film growth rate are

  4. Improved transport properties of polycrystalline YBCO thin-films

    NASA Astrophysics Data System (ADS)

    Azoulay, J.; Verdyan, A.; Lapsker, I.

    1994-12-01

    Resistive evaporation technique was used to fabricate polycrystalline YBaCuO and YBaNaCuO thin films on MgO substrates. Heat treatment was carried out in a low oxygen partial pressure. Polycrystalline YBCO and Na doped YBCO thin films samples were thus obtained using the same technique and conditions. The critical current density of Na doped YBCO sample was measured to be significantly higher than that of the undoped YBCO one. The results are discussed in terms of the Na contribution to the intragrain conductivity.

  5. Dynamical electrophotoconductivity in polycrystalline thin films

    NASA Technical Reports Server (NTRS)

    Kowel, S. T.; Kornreich, P. G.

    1982-01-01

    Polycrystalline cadmium sulfide (CdS) films were deposited on lithium niobate (LiNbO3) substrates by vacuum evaporation and annealed to obtain high photosensitivity. The change in photoconductivity of these films due to the penetration of electric fields associated with elastic waves propagating on their substrates was demonstrated and studied. The relationship between the acoustic electric field and the induced change in film conductivity was found to be a nonlinear one. The fractional change in conductivity is strongly dependent on the light intensity and the film temperature, showing a prominent maximum as a function of these quantities. The largest recorded fractional change in conductivity was about 25% at electric fields of the order of 1,000 volts per centimeter. A phenomological model was developed based on the interaction between the space charge created by the electric field and the electron trapping states in the photoconductor.

  6. Polycrystalline Thin Film Device Degradation Studies

    SciTech Connect

    Albin, D. S.; McMahon, T. J.; Pankow, J. W.; Noufi, R.; Demtsu, S. H.; Davies, A.

    2005-11-01

    Oxygen during vapor CdCl2 (VCC) treatments significantly reduced resistive shunts observed in CdS/CdTe polycrystalline devices using thinner CdS layers during 100 deg C, open-circuit, 1-sun accelerated stress testing. Cu oxidation resulting from the reduction of various trace oxides present in as-grown and VCC treated films is the proposed mechanism by which Cu diffusion, and subsequent shunts are controlled. Graphite paste layers between metallization and CdTe behave like diffusion barriers and similarly benefit device stability. Ni-based contacts form a protective Ni2Te3 intermetallic layer that reduces metal diffusion but degrades performance through increased series resistance.

  7. Thin film polycrystalline silicon: Promise and problems in displays and solar cells

    SciTech Connect

    Fonash, S.J.

    1995-08-01

    Thin film polycrystalline Si (poly-Si) with its carrier mobilities, potentially good stability, low intragrain defect density, compatibility with silicon processing, and ease of doping activation is an interesting material for {open_quotes}macroelectronics{close_quotes} applications such as TFTs for displays and solar cells. The poly-Si films needed for these applications can be ultra-thin-in the 500{Angstrom} to 1000{Angstrom} thickness range for flat panel display TFTs and in the 4{mu}m to 10{mu}m thickness range for solar cells. Because the films needed for these microelectronics applications can be so thin, an effective approach to producing the films is that of crystallizing a-Si precursor material. Unlike cast materials, poly-Si films made this way can be produced using low temperature processing. Unlike deposited poly-Si films, these crystallized poly-Si films can have grain widths that are much larger than the film thickness and almost atomically smooth surfaces. This thin film poly-Si crystallized from a-Si precursor films, and its promise and problems for TFTs and solar cells, is the focus of this discussion.

  8. Flexible polycrystalline thin-film photovoltaics for space applications

    NASA Technical Reports Server (NTRS)

    Armstrong, J. H.; Lanning, B. R.; Misra, M. S.; Kapur, V. K.; Basol, B. M.

    1993-01-01

    Polycrystalline thin-film photovoltaics (PV), such as CIS and CdTe, have received considerable attention recently with respect to space power applications. Their combination of stability, efficiency, and economy from large-scale monolithic-integration of modules can have significant impact on cost and weight of PV arrays for spacecraft and planetary experiments. An added advantage, due to their minimal thickness (approximately 6 microns sans substrate), is the ability to manufacture lightweight, flexible devices (approximately 2000 W/kg) using large-volume manufacturing techniques. The photovoltaic effort at Martin Marietta and ISET is discussed, including large-area, large-volume thin-film deposition techniques such as electrodeposition and rotating cylindrical magnetron sputtering. Progress in the development of flexible polycrystalline thin-film PV is presented, including evaluation of flexible CIS cells. In addition, progress on flexible CdTe cells is presented. Finally, examples of lightweight, flexible arrays and their potential cost and weight impact is discussed.

  9. Nucleation and growth of polycrystalline SiC

    NASA Astrophysics Data System (ADS)

    Kaiser, M.; Schimmel, S.; Jokubavicius, V.; Linnarsson, M. K.; Ou, H.; Syväjärvi, M.; Wellmann, P.

    2014-03-01

    The nucleation and bulk growth of polycrystalline SiC in a 2 inch PVT setup using isostatic and pyrolytic graphite as substrates was studied. Textured nucleation occurs under near-thermal equilibrium conditions at the initial growth stage with hexagonal platelet shaped crystallites of 4H, 6H and 15R polytypes. It is found that pyrolytic graphite results in enhanced texturing of the nucleating gas species. Reducing the pressure leads to growth of the crystallites until a closed polycrystalline SiC layer containing voids with a rough surface is developed. Bulk growth was conducted at 35 mbar Ar pressure at 2250°C in diffusion limited mass transport regime generating a convex shaped growth form of the solid-gas interface leading to lateral expansion of virtually [001] oriented crystallites. Growth at 2350°C led to the stabilization of 6H polytypic grains. The micropipe density in the bulk strongly depends on the substrate used.

  10. Directed vapor deposition of amorphous and polycrystalline electronic materials: Nonhydrogenated a-Si

    SciTech Connect

    Groves, J.F.; Jones, S.H.; Globus, T.; Hsiung, L.M.; Wadley, H.

    1995-10-01

    A novel directed vapor deposition (DVD) process for creating amorphous and polycrystalline electronic materials is reported. Initial experimental results for DVD of nonhydrogenated a-Si indicate that growth rates at least between 0.02 and 1.0 {micro}m/min can be achieved. In this process, evaporated silicon is efficiently entrained in a previously formed low pressure supersonic He jet. The silicon is evaporated using a high energy, high voltage, electron beam. The collimated jet of He entrained with silicon is used to deposit thin films of a-Si at room temperature on glass substrates. Initial TEM microstructure analysis and optical absorption analysis is presented.

  11. Phase transitions from semiconductive amorphous to conductive polycrystalline in indium silicon oxide thin films

    NASA Astrophysics Data System (ADS)

    Mitoma, Nobuhiko; Da, Bo; Yoshikawa, Hideki; Nabatame, Toshihide; Takahashi, Makoto; Ito, Kazuhiro; Kizu, Takio; Fujiwara, Akihiko; Tsukagoshi, Kazuhito

    2016-11-01

    The enhancement in electrical conductivity and optical transparency induced by a phase transition from amorphous to polycrystalline in lightly silicon-doped indium oxide (InSiO) thin films is studied. The phase transition caused by simple thermal annealing transforms the InSiO thin films from semiconductors to conductors. Silicon atoms form SiO4 tetrahedra in InSiO, which enhances the overlap of In 5s orbitals as a result of the distortion of InO6 octahedral networks. Desorption of weakly bonded oxygen releases electrons from deep subgap states and enhances the electrical conductivity and optical transparency of the films. Optical absorption and X-ray photoelectron spectroscopy measurements reveal that the phase transition causes a Fermi energy shift of ˜0.2 eV.

  12. Creep behavior for advanced polycrystalline SiC fibers

    SciTech Connect

    Youngblood, G.E.; Jones, R.H.; Kohyama, Akira

    1997-04-01

    A bend stress relaxation (BSR) test has been utilized to examine irradiation enhanced creep in polycrystalline SiC fibers which are under development for use as fiber reinforcement in SiC/SiC composite. Qualitative, S-shaped 1hr BSR curves were compared for three selected advanced SiC fiber types and standard Nicalon CG fiber. The temperature corresponding to the middle of the S-curve (where the BSR parameter m = 0.5) is a measure of a fiber`s thermal stability as well as it creep resistance. In order of decreasing thermal creep resistance, the measured transition temperatures were Nicalon S (1450{degrees}C), Sylramic (1420{degrees}C), Hi-Nicalon (1230{degrees}C) and Nicalon CG (1110{degrees}C).

  13. GaAs nanowire growth on polycrystalline silicon thin films using selective-area MOVPE.

    PubMed

    Ikejiri, Keitaro; Ishizaka, Fumiya; Tomioka, Katsuhiro; Fukui, Takashi

    2013-03-22

    The growth mechanism of GaAs nanowires (NWs) grown on polycrystalline silicon (poly-Si) thin films using selective-area metalorganic vapor-phase epitaxy was investigated. Wire structures were selectively grown in the mask openings on a poly-Si substrate. The appearance ratio of wire structures strongly depended on the growth conditions and deposition temperature of the poly-Si substrate. Evaluation of the grown shapes and growth characteristics revealed that GaAs NWs grown on a poly-Si substrate have the same growth mechanism as conventional GaAs NWs grown on a single-crystalline GaAs or Si substrate. Experiments showed that the wire structure yield can be improved by increasing the Si grain size and/or increasing the Si deposition temperature. The growth model proposed for understanding NW growth on poly-Si is based on the mask opening size, the Si grain size, and the growth conditions. The ability to control the growth mode is promising for the formation of NWs with complex structures on poly-Si thin layers.

  14. Fabrication of polycrystalline thin films by pulsed laser processing

    DOEpatents

    Mitlitsky, F.; Truher, J.B.; Kaschmitter, J.L.; Colella, N.J.

    1998-02-03

    A method is disclosed for fabricating polycrystalline thin films on low-temperature (or high-temperature) substrates which uses processing temperatures that are low enough to avoid damage to the substrate, and then transiently heating select layers of the thin films with at least one pulse of a laser or other homogenized beam source. The pulse length is selected so that the layers of interest are transiently heated to a temperature which allows recrystallization and/or dopant activation while maintaining the substrate at a temperature which is sufficiently low to avoid damage to the substrate. This method is particularly applicable in the fabrication of solar cells. 1 fig.

  15. Fabrication of polycrystalline thin films by pulsed laser processing

    DOEpatents

    Mitlitsky, Fred; Truher, Joel B.; Kaschmitter, James L.; Colella, Nicholas J.

    1998-02-03

    A method for fabricating polycrystalline thin films on low-temperature (or high-temperature) substrates which uses processing temperatures that are low enough to avoid damage to the substrate, and then transiently heating select layers of the thin films with at least one pulse of a laser or other homogenized beam source. The pulse length is selected so that the layers of interest are transiently heated to a temperature which allows recrystallization and/or dopant activation while maintaining the substrate at a temperature which is sufficiently low to avoid damage to the substrate. This method is particularly applicable in the fabrication of solar cells.

  16. Progress and issues in polycrystalline thin-film PV technologies

    SciTech Connect

    Zweibel, K.; Ullal, H.S.; Roedern, B. von

    1996-05-01

    Substantial progress has occurred in polycrystalline thin-film photovoltaic technologies in the past 18 months. However, the transition to first-time manufacturing is still under way, and technical problems continue. This paper focuses on the promise and the problems of the copper indium diselenide and cadmium telluride technologies, with an emphasis on continued R&D needs for the near-term transition to manufacturing and for next-generation improvements. In addition, it highlights the joint R&D efforts being performed in the U.S. Department of Energy/National Renewable Energy Laboratory Thin-Film Photovoltaic Partnership Program.

  17. Controlled nanostructuration of polycrystalline tungsten thin films

    SciTech Connect

    Girault, B.; Eyidi, D.; Goudeau, P.; Guerin, P.; Bourhis, E. Le; Renault, P.-O.; Sauvage, T.

    2013-05-07

    Nanostructured tungsten thin films have been obtained by ion beam sputtering technique stopping periodically the growing. The total thickness was maintained constant while nanostructure control was obtained using different stopping periods in order to induce film stratification. The effect of tungsten sublayers' thicknesses on film composition, residual stresses, and crystalline texture evolution has been established. Our study reveals that tungsten crystallizes in both stable {alpha}- and metastable {beta}-phases and that volume proportions evolve with deposited sublayers' thicknesses. {alpha}-W phase shows original fiber texture development with two major preferential crystallographic orientations, namely, {alpha}-W<110> and unexpectedly {alpha}-W<111> texture components. The partial pressure of oxygen and presence of carbon have been identified as critical parameters for the growth of metastable {beta}-W phase. Moreover, the texture development of {alpha}-W phase with two texture components is shown to be the result of a competition between crystallographic planes energy minimization and crystallographic orientation channeling effect maximization. Controlled grain size can be achieved for the {alpha}-W phase structure over 3 nm stratification step. Below, the {beta}-W phase structure becomes predominant.

  18. Thin film polycrystalline silicon nanowire biosensors.

    PubMed

    Hakim, Mohammad M A; Lombardini, Marta; Sun, Kai; Giustiniano, Francesco; Roach, Peter L; Davies, Donna E; Howarth, Peter H; de Planque, Maurits R R; Morgan, Hywel; Ashburn, Peter

    2012-04-11

    Polysilicon nanowire biosensors have been fabricated using a top-down process and were used to determine the binding constant of two inflammatory biomarkers. A very low cost nanofabrication process was developed, based on simple and mature photolithography, thin film technology, and plasma etching, enabling an easy route to mass manufacture. Antibody-functionalized nanowire sensors were used to detect the proteins interleukin-8 (IL-8) and tumor necrosis factor-alpha (TNF-α) over a wide range of concentrations, demonstrating excellent sensitivity and selectivity, exemplified by a detection sensitivity of 10 fM in the presence of a 100,000-fold excess of a nontarget protein. Nanowire titration curves gave antibody-antigen dissociation constants in good agreement with low-salt enzyme-linked immunosorbent assays (ELISAs). This fabrication process produces high-quality nanowires that are suitable for low-cost mass production, providing a realistic route to the realization of disposable nanoelectronic point-of-care (PoC) devices.

  19. Advances in polycrystalline thin-film photovoltaics for space applications

    SciTech Connect

    Lanning, B.R.; Armstrong, J.H.; Misra, M.S.

    1994-09-01

    Polycrystalline, thin-film photovoltaics represent one of the few (if not the only) renewable power sources which has the potential to satisfy the demanding technical requirements for future space applications. The demand in space is for deployable, flexible arrays with high power-to-weight ratios and long-term stability (15-20 years). In addition, there is also the demand that these arrays be produced by scalable, low-cost, high yield, processes. An approach to significantly reduce costs and increase reliability is to interconnect individual cells series via monolithic integration. Both CIS and CdTe semiconductor films are optimum absorber materials for thin-film n-p heterojunction solar cells, having band gaps between 0.9-1.5 eV and demonstrated small area efficiencies, with cadmium sulfide window layers, above 16.5 percent. Both CIS and CdTe polycrystalline thin-film cells have been produced on a laboratory scale by a variety of physical and chemical deposition methods, including evaporation, sputtering, and electrodeposition. Translating laboratory processes which yield these high efficiency, small area cells into the design of a manufacturing process capable of producing 1-sq ft modules, however, requires a quantitative understanding of each individual step in the process and its effect on overall module performance. With a proper quantification and understanding of material transport and reactivity for each individual step, manufacturing process can be designed that is not `reactor-specific` and can be controlled intelligently with the design parameters of the process. The objective of this paper is to present an overview of the current efforts at MMC to develop large-scale manufacturing processes for both CIS and CdTe thin-film polycrystalline modules. CIS cells/modules are fabricated in a `substrate configuration` by physical vapor deposition techniques and CdTe cells/modules are fabricated in a `superstrate configuration` by wet chemical methods.

  20. Suppressing light reflection from polycrystalline silicon thin films through surface texturing and silver nanostructures

    SciTech Connect

    Akhter, Perveen; Huang, Mengbing Kadakia, Nirag; Spratt, William; Malladi, Girish; Bakhru, Hassarum

    2014-09-21

    This work demonstrates a novel method combining ion implantation and silver nanostructures for suppressing light reflection from polycrystalline silicon thin films. Samples were implanted with 20-keV hydrogen ions to a dose of 10¹⁷/cm², and some of them received an additional argon ion implant to a dose of 5×10¹⁵ /cm² at an energy between 30 and 300 keV. Compared to the case with a single H implant, the processing involved both H and Ar implants and post-implantation annealing has created a much higher degree of surface texturing, leading to a more dramatic reduction of light reflection from polycrystalline Si films over a broadband range between 300 and 1200 nm, e.g., optical reflection from the air/Si interface in the AM1.5 sunlight condition decreasing from ~30% with an untextured surface to below 5% for a highly textured surface after post-implantation annealing at 1000°C. Formation of Ag nanostructures on these ion beam processed surfaces further reduces light reflection, and surface texturing is expected to have the benefit of diminishing light absorption losses within large-size (>100 nm) Ag nanoparticles, yielding an increased light trapping efficiency within Si as opposed to the case with Ag nanostructures on a smooth surface. A discussion of the effects of surface textures and Ag nanoparticles on light trapping within Si thin films is also presented with the aid of computer simulations.

  1. Advances in polycrystalline thin-film photovoltaics for space applications

    NASA Astrophysics Data System (ADS)

    Lanning, Bruce R.; Armstrong, Joseph H.; Misra, Mohan S.

    1994-09-01

    Polycrystalline, thin-film photovoltaics represent one of the few (if not the only) renewable power sources which has the potential to satisfy the demanding technical requirements for future space applications. The demand in space is for deployable, flexible arrays with high power-to-weight ratios and long-term stability (15-20 years). In addition, there is also the demand that these arrays be produced by scalable, low-cost, high yield, processes. An approach to significantly reduce costs and increase reliability is to interconnect individual cells series via monolithic integration. Both CIS and CdTe semiconductor films are optimum absorber materials for thin-film n-p heterojunction solar cells, having band gaps between 0.9-1.5 ev and demonstrated small area efficiencies, with cadmium sulfide window layers, above 16.5 percent. Both CIS and CdTe polycrystalline thin-film cells have been produced on a laboratory scale by a variety of physical and chemical deposition methods, including evaporation, sputtering, and electrodeposition. Translating laboratory processes which yield these high efficiency, small area cells into the design of a manufacturing process capable of producing 1-sq ft modules, however, requires a quantitative understanding of each individual step in the process and its (each step) effect on overall module performance. With a proper quantification and understanding of material transport and reactivity for each individual step, manufacturing process can be designed that is not 'reactor-specific' and can be controlled intelligently with the design parameters of the process. The objective of this paper is to present an overview of the current efforts at MMC to develop large-scale manufacturing processes for both CIS and CdTe thin-film polycrystalline modules. CIS cells/modules are fabricated in a 'substrate configuration' by physical vapor deposition techniques and CdTe cells/modules are fabricated in a 'superstrate configuration' by wet chemical

  2. Advances in polycrystalline thin-film photovoltaics for space applications

    NASA Technical Reports Server (NTRS)

    Lanning, Bruce R.; Armstrong, Joseph H.; Misra, Mohan S.

    1994-01-01

    Polycrystalline, thin-film photovoltaics represent one of the few (if not the only) renewable power sources which has the potential to satisfy the demanding technical requirements for future space applications. The demand in space is for deployable, flexible arrays with high power-to-weight ratios and long-term stability (15-20 years). In addition, there is also the demand that these arrays be produced by scalable, low-cost, high yield, processes. An approach to significantly reduce costs and increase reliability is to interconnect individual cells series via monolithic integration. Both CIS and CdTe semiconductor films are optimum absorber materials for thin-film n-p heterojunction solar cells, having band gaps between 0.9-1.5 ev and demonstrated small area efficiencies, with cadmium sulfide window layers, above 16.5 percent. Both CIS and CdTe polycrystalline thin-film cells have been produced on a laboratory scale by a variety of physical and chemical deposition methods, including evaporation, sputtering, and electrodeposition. Translating laboratory processes which yield these high efficiency, small area cells into the design of a manufacturing process capable of producing 1-sq ft modules, however, requires a quantitative understanding of each individual step in the process and its (each step) effect on overall module performance. With a proper quantification and understanding of material transport and reactivity for each individual step, manufacturing process can be designed that is not 'reactor-specific' and can be controlled intelligently with the design parameters of the process. The objective of this paper is to present an overview of the current efforts at MMC to develop large-scale manufacturing processes for both CIS and CdTe thin-film polycrystalline modules. CIS cells/modules are fabricated in a 'substrate configuration' by physical vapor deposition techniques and CdTe cells/modules are fabricated in a 'superstrate configuration' by wet chemical

  3. Synthesis and characterization of large-grain solid-phase crystallized polycrystalline silicon thin films

    SciTech Connect

    Kumar, Avishek E-mail: dalapatig@imre.a-star.edu.sg; Law, Felix; Widenborg, Per I.; Dalapati, Goutam K. E-mail: dalapatig@imre.a-star.edu.sg; Subramanian, Gomathy S.; Tan, Hui R.; Aberle, Armin G.

    2014-11-01

    n-type polycrystalline silicon (poly-Si) films with very large grains, exceeding 30 μm in width, and with high Hall mobility of about 71.5 cm{sup 2}/V s are successfully prepared by the solid-phase crystallization technique on glass through the control of the PH{sub 3} (2% in H{sub 2})/SiH{sub 4} gas flow ratio. The effect of this gas flow ratio on the electronic and structural quality of the n-type poly-Si thin film is systematically investigated using Hall effect measurements, Raman microscopy, and electron backscatter diffraction (EBSD), respectively. The poly-Si grains are found to be randomly oriented, whereby the average area weighted grain size is found to increase from 4.3 to 18 μm with increase of the PH{sub 3} (2% in H{sub 2})/SiH{sub 4} gas flow ratio. The stress in the poly-Si thin films is found to increase above 900 MPa when the PH{sub 3} (2% in H{sub 2})/SiH{sub 4} gas flow ratio is increased from 0.025 to 0.45. Finally, high-resolution transmission electron microscopy, high angle annular dark field-scanning tunneling microscopy, and EBSD are used to identify the defects and dislocations caused by the stress in the fabricated poly-Si films.

  4. Anisotropic thermal conductivity of thin polycrystalline oxide samples

    SciTech Connect

    Tiwari, A.; Boussois, K.; Nait-Ali, B.; Smith, D. S.; Blanchart, P.

    2013-11-15

    This paper reports about the development of a modified laser-flash technique and relation to measure the in-plane thermal diffusivity of thin polycrystalline oxide samples. Thermal conductivity is then calculated with the product of diffusivity, specific heat and density. Design and operating features for evaluating in-plane thermal conductivities are described. The technique is advantageous as thin samples are not glued together to measure in-plane thermal conductivities like earlier methods reported in literature. The approach was employed to study anisotropic thermal conductivity in alumina sheet, textured kaolin ceramics and montmorillonite. Since it is rare to find in-plane thermal conductivity values for such anisotropic thin samples in literature, this technique offers a useful variant to existing techniques.

  5. Boron- and phosphorus-doped polycrystalline silicon thin films prepared by silver-induced layer exchange

    SciTech Connect

    Antesberger, T.; Wassner, T. A.; Jaeger, C.; Algasinger, M.; Kashani, M.; Scholz, M.; Matich, S.; Stutzmann, M.

    2013-05-27

    Intentional boron and phosphorus doping of polycrystalline silicon thin films on glass prepared by the silver-induced layer exchange is presented. A silver/(titanium) oxide/amorphous silicon stack is annealed at temperatures below the eutectic temperature of the Ag/Si system, leading to a complete layer exchange and simultaneous crystallization of the amorphous silicon. Intentional doping of the amorphous silicon prior to the exchange process results in boron- or phosphorus-doped polycrystalline silicon. Hall effect measurements show carrier concentrations between 2 Multiplication-Sign 10{sup 17} cm{sup -3} and 3 Multiplication-Sign 10{sup 20} cm{sup -3} for phosphorus and 4 Multiplication-Sign 10{sup 18} cm{sup -3} to 3 Multiplication-Sign 10{sup 19} cm{sup -3} for boron-doped layers, with carrier mobilities up to 90 cm{sup 2}/V s.

  6. Properties of boron-doped thin films of polycrystalline silicon

    SciTech Connect

    Merabet, Souad

    2013-12-16

    The properties of polycrystalline-silicon films deposited by low pressure chemical vapor deposition and doped heavily in situ boron-doped with concentration level of around 2×10{sup 20}cm{sup −3} has been studied. Their properties are analyzed using electrical and structural characterization means by four points probe resistivity measurements and X-ray diffraction spectra. The thermal-oxidation process are performed on sub-micron layers of 200nm/c-Si and 200nm/SiO{sub 2} deposited at temperatures T{sub d} ranged between 520°C and 605°C and thermally-oxidized in dry oxygen ambient at 945°C. Compared to the as-grown resistivity with silicon wafers is known to be in the following sequence <ρ{sub 200nm/c−Si}> < <ρ{sub 200nm/SiO2}> and <ρ{sub 520}> < <ρ{sub 605}>. The measure X-ray spectra is shown, that the Bragg peaks are marked according to the crystal orientation in the film deposited on bare substrates (poly/c-Si), for the second series of films deposited on bare oxidized substrates (poly/SiO{sub 2}) are clearly different.

  7. Creep behavior for advanced polycrystalline SiC fibers

    SciTech Connect

    Youngblood, G.E.; Jones, R.H.; Kohyama, Akira

    1997-08-01

    A bend stress relaxation (BSR) test is planned to examine irradiation enhanced creep in polycrystalline SiC fibers which are under development for use as fiber reinforcement in SiC/SiC composite. Baseline 1 hr and 100 hr BSR thermal creep {open_quotes}m{close_quotes} curves have been obtained for five selected advanced SiC fiber types and for standard Nicalon CG fiber. The transition temperature, that temperature where the S-shaped m-curve has a value 0.5, is a measure of fiber creep resistance. In order of decreasing thermal creep resistance, with the 100 hr BSR transition temperature given in parenthesis, the fibers ranked: Sylramic (1261{degrees}C), Nicalon S (1256{degrees}C), annealed Hi Nicalon (1215{degrees}C), Hi Nicalon (1078{degrees}C), Nicalon CG (1003{degrees}C) and Tyranno E (932{degrees}C). The thermal creep for Sylramic, Nicalon S, Hi Nicalon and Nicalon CG fibers in a 5000 hr irradiation creep BSR test is projected from the temperature dependence of the m-curves determined during 1 and 100 hr BSR control tests.

  8. Different spin relaxation mechanisms between epitaxial and polycrystalline Ta thin films

    NASA Astrophysics Data System (ADS)

    Gamou, Hiromu; Ryu, Jeongchun; Kohda, Makoto; Nitta, Junsaku

    2017-02-01

    We demonstrate that spin relaxation mechanisms are different between epitaxial Ta and disordered polycrystalline Ta thin films by determining the relationship between spin relaxation time and diffusion constant. To control the diffusion constant, epitaxial Ta and polycrystalline Ta thin films are prepared by sputtering on different substrates and at different growth temperatures. The spin relaxation time is extracted from the results of weak antilocalization analysis including the superconducting fluctuation effect. The dominant spin relaxation mechanism for polycrystalline Ta thin films is the Elliot–Yafet mechanism, as is expected for centrosymmetric metal films. In contrast, the D’yakonov–Perel’ mechanism plays a role in epitaxial Ta thin films.

  9. Activation of ion-implanted polycrystalline silicon thin films prepared on glass substrates

    SciTech Connect

    So, Byoung-Soo; Bae, Seung-Muk; You, Yil-Hwan; Kim, Young-Hwan; Hwang, Jin-Ha

    2012-10-15

    Phosphorous-implanted polycrystalline Si thin films were subjected to thermal annealing between 300 °C and 650 °C. The thermal activation was monitored electrically and structurally using Hall measurements, Raman spectroscopy, UV–visible spectrophotometry, and transmission electron microscopy. Charge transport information was correlated to the corresponding structural evolution in thermal activation. Phosphorous-implanted activation is divided into short-range ordering at low temperatures and long-range ordering at high temperatures, with the boundary between low and high temperatures set at 425 °C. Short-range ordering allows for significant increase in electronic concentration through substitution of P for Si. Higher temperatures are attributed to long-range ordering, thereby increasing electronic mobility.

  10. Magnetoelectric coupling effect in transition metal modified polycrystalline BiFeO3 thin films

    NASA Astrophysics Data System (ADS)

    Sreenivas Puli, Venkata; Kumar Pradhan, Dhiren; Gollapudi, Sreenivasulu; Coondoo, Indrani; Panwar, Neeraj; Adireddy, Shiva; Chrisey, Douglas B.; Katiyar, Ram S.

    2014-11-01

    Rare-earth (Sm) and transition metal (Co) modified polycrystalline BiFeO3 (BFO) thin films have been deposited on Pt/TiO2/SiO2/Si substrate successfully through pulsed laser deposition (PLD) technique. Piezoelectric, leakage current and temperature dependent dielectric and magnetic behaviour were investigated for the films. Typical “butterfly-shaped” loop were observed in BSFCO films with an effective piezoelectric constant (d33) ~94 pm/V at 0.6 MV/cm. High dielectric constant ~900 and low dielectric loss ~0.25 were observed at room temperature. M-H loops have shown relatively high saturation magnetization ~35 emu/cm3 at a maximum field of H ~20 kOe. Enhanced magnetoelectric coupling response is observed under applied magnetic field. The multiferroic, piezoelectric, leakage current behaviours were explored. Such studies should be helpful in designing multiferroic materials based on BSFCO films.

  11. Noise Characterization of Polycrystalline Silicon Thin Film Transistors for X-ray Imagers Based on Active Pixel Architectures.

    PubMed

    Antonuk, L E; Koniczek, M; McDonald, J; El-Mohri, Y; Zhao, Q; Behravan, M

    2008-01-01

    An examination of the noise of polycrystalline silicon thin film transistors, in the context of flat panel x-ray imager development, is reported. The study was conducted in the spirit of exploring how the 1/f, shot and thermal noise components of poly-Si TFTs, determined from current noise power spectral density measurements, as well as through calculation, can be used to assist in the development of imagers incorporating pixel amplification circuits based on such transistors.

  12. Superconductor—Insulator Transitions in Pure Polycrystalline Nb Thin Films

    NASA Astrophysics Data System (ADS)

    Couedo, F.; Crauste, O.; Bergé, L.; Dolgorouky, Y.; Marrache-Kikuchi, C.; Dumoulin, L.

    2012-12-01

    We report on a study of the transport properties of Nb thin films. By varying the thickness of the films from 263 Å to 25 Å, we observed a depression of the superconductivity. Magnetic field was also applied up to 6 T, inducing the disappearance of the superconductivity and the onset of an insulating behavior. The results were compared to those we have already obtained on a highly disordered system, a-NbxSi1-x, to understand whether the same mechanisms for the disappearance of the superconductivity could be at play in pure metallic thin films and in highly disordered systems.

  13. Poly-crystalline thin-film by aluminum induced crystallization on aluminum nitride substrate

    NASA Astrophysics Data System (ADS)

    Bhopal, Muhammad Fahad; Lee, Doo Won; Lee, Soo Hong

    2016-09-01

    Thin-film polycrystalline silicon ( pc-Si) on foreign (non-silicon) substrates has been researched by various research groups for the production of photovoltaic cells. High quality pc-Si deposition on foreign substrates with superior optical properties is considered to be the main hurdle in cell fabrication. Metal induced crystallization (MIC) is one of the renowned techniques used to produce this quality of material. In the current study, an aluminum induced crystallization (AIC) method was adopted to produce pc-Si thin-film on aluminum nitride (AlN) substrate by a seed layer approach. Aluminum and a-Si layer were deposited using an e-beam evaporator. Various annealing conditions were used in order to investigate the AIC grown pc-Si seed layers for process optimization. The effect of thermal annealing on grain size, defects preferentially crystallographic orientation of the grains were analyzed. Surface morphology was studied using an optical microscope. Poly-silicon film with a crystallinity fraction between 95-100% and an FWHM between 5-6 cm-1 is achievable at low temperatures and for short time intervals. A grain size of about 10 micron can be obtained at a low deposition rate on an AIN substrate. Similarly, Focused ion beam (FIB) also showed that at 425 °C sample B and at 400 °C sample A were fully crystallized. The crystalline quality of pc-Si was evaluated using μ-Raman spectroscopy as a function of annealed conditions and Grazing incidence X-ray diffraction (GIXRD) was used to determine the phase direction of the pc-Si layer. The current study implicates that a poly-silicon layer with good crystallographic orientation and crystallinity fraction is achievable on AIN substrate at low temperatures and short time frames.

  14. Compressive creep of polycrystalline ZrSiO{sub 4}.

    SciTech Connect

    Goretta, K. C.; Cruse, T. A.; Koritala, R. E.; Routbort, J. L.; Melendez-Martinez, J. J.; de Arellano-Lopez, A. R.; Univ. de Sevilla

    2001-08-01

    Polycrystalline ZrSiO{sub 4} ceramics were prepared from commercial powder. Silicate-based glass phase was observed at multiple-grain junctions. compressive creep tests were conducted in Ar at 1197-1400{sup o}C. For stresses of {approx}1-120 MPa, steady-state creep occurred by diffusional flow. For stresses of >3 MPa, the steady-state strain rate {dot {var_epsilon}} could be expressed as {dot {var_epsilon}} = A{sigma}{sup 1.1{+-}0.1}exp - [(470 {+-} 40 kJ/mol)/RT], where A is a constant, {sigma} the steady-state stress, R the gas constant, and T the absolute temperature. At 1400{sup o}C and 1 MPa, an increase in the value of n was observed. Electron microscopy revealed no deformation-induced change in the microstructures of any of the specimens, which is consistent with creep by diffusion-controlled grain-boundary sliding. Comparison with literature data indicated that volume diffusion of oxygen controlled the creep rate.

  15. Wetting of polycrystalline SiC by molten Al and Al-Si alloys

    NASA Astrophysics Data System (ADS)

    Cong, Xiao-Shuang; Shen, Ping; Wang, Yi; Jiang, Qichuan

    2014-10-01

    The wetting of α-SiC by molten Al and Al-Si alloys was investigated using a dispensed sessile drop method in a high vacuum. In the Al-SiC system, representative wetting stages were identified. The liquid spreading was initially controlled by the deoxidation of the SiC surface and then by the formation of Al4C3 at the interface. The intrinsic contact angle for molten Al on the polycrystalline α-SiC surface was suggested to be lower than 90̊ provided that the oxide films covering the Al and SiC surfaces were removed, i.e., the system is partial wetting in nature. An increase in the Si concentration in liquid Al weakened the interfacial reaction but improved the final wettability. The role of the Si addition on the wetting was presumably attributed to its segregation at the interface and the formation of strong chemical bonds with the SiC surface.

  16. High-Efficiency Polycrystalline Thin Film Tandem Solar Cells.

    PubMed

    Kranz, Lukas; Abate, Antonio; Feurer, Thomas; Fu, Fan; Avancini, Enrico; Löckinger, Johannes; Reinhard, Patrick; Zakeeruddin, Shaik M; Grätzel, Michael; Buecheler, Stephan; Tiwari, Ayodhya N

    2015-07-16

    A promising way to enhance the efficiency of CIGS solar cells is by combining them with perovskite solar cells in tandem devices. However, so far, such tandem devices had limited efficiency due to challenges in developing NIR-transparent perovskite top cells, which allow photons with energy below the perovskite band gap to be transmitted to the bottom cell. Here, a process for the fabrication of NIR-transparent perovskite solar cells is presented, which enables power conversion efficiencies up to 12.1% combined with an average sub-band gap transmission of 71% for photons with wavelength between 800 and 1000 nm. The combination of a NIR-transparent perovskite top cell with a CIGS bottom cell enabled a tandem device with 19.5% efficiency, which is the highest reported efficiency for a polycrystalline thin film tandem solar cell. Future developments of perovskite/CIGS tandem devices are discussed and prospects for devices with efficiency toward and above 27% are given.

  17. Polycrystalline Thin-Film Research: Copper Indium Gallium Diselenide (Fact Sheet)

    SciTech Connect

    Not Available

    2011-06-01

    Capabilities fact sheet for the National Center for Photovoltaics: Polycrystalline Thin-Film Research: Copper Indium Gallium Diselenide that includes scope, core competencies and capabilities, and contact/web information.

  18. Fundamentals of polycrystalline thin film materials and devices

    SciTech Connect

    Baron, B.N.; Birkmire, R.W.; Phillips, J.E.; Shafarman, W.N.; Hegedus, S.S.; McCandless, B.E. . Inst. of Energy Conversion)

    1991-01-01

    This report presents the results of a one-year research program on polycrystalline thin-film solar cells. The research was conducted to better understand the limitations and potential of solar cells using CuInSe{sub 2} and CdTe by systematically investigating the fundamental relationships linking material processing, material properties, and device behavior. By selenizing Cu and In layers, we fabricated device-quality CuInSe{sub 2} thin films and demonstrated a CuInSe{sub 2} solar cell with 7% efficiency. We added Ga, to increase the band gap of CuInSe{sub 2} devices to increase the open-circuit voltage to 0.55 V. We fabricated and analyzed Cu(InGa)Se{sub 2}/CuInSe{sub 2} devices to demonstrate the potential for combining the benefits of higher V{sub oc} while retaining the current-generating capacity of CuInSe{sub 2}. We fabricated an innovative superstrate device design with more than 5% efficiency, as well as a bifacial spectral-response technique for determining the electron diffusion length and optical absorption coefficient of CuInSe{sub 2} in an operational cell. The diffusion length was found to be greater than 1 {mu}m. We qualitatively modeled the effect of reducing heat treatments in hydrogen and oxidizing treatments in air on the I-V behavior of CuInSe{sub 2} devices. We also investigated post-deposition heat treatments and chemical processing and used them to fabricate a 9.6%-efficient CdTe/CdS solar cell using physical vapor deposition.

  19. Broadening of optical transitions in polycrystalline CdS and CdTe thin films

    SciTech Connect

    Li Jian; Chen Jie; Collins, R. W.

    2010-11-01

    The dielectric functions {epsilon} of polycrystalline CdS and CdTe thin films sputter deposited onto Si wafers were measured from 0.75 to 6.5 eV by in situ spectroscopic ellipsometry. Differences in {epsilon} due to processing variations are well understood using an excited carrier scattering model. For each sample, a carrier mean free path {lambda} is defined that is found to be inversely proportional to the broadening of each of the band structure critical points (CPs) deduced from {epsilon}. The rate at which broadening occurs with {lambda}{sup -1} is different for each CP, enabling a carrier group speed {upsilon}{sub g} to be identified for the CP. With the database for {upsilon}{sub g}, {epsilon} can be analyzed to evaluate the quality of materials used in CdS/CdTe photovoltaic heterojunctions.

  20. Charge carrier transport in polycrystalline organic thin film based field effect transistors

    NASA Astrophysics Data System (ADS)

    Rani, Varsha; Sharma, Akanksha; Ghosh, Subhasis

    2016-05-01

    The charge carrier transport mechanism in polycrystalline thin film based organic field effect transistors (OFETs) has been explained using two competing models, multiple trapping and releases (MTR) model and percolation model. It has been shown that MTR model is most suitable for explaining charge carrier transport in grainy polycrystalline organic thin films. The energetic distribution of traps determined independently using Mayer-Neldel rule (MNR) is in excellent agreement with the values obtained by MTR model for copper phthalocyanine and pentacene based OFETs.

  1. On-Current Modeling of Polycrystalline Silicon Thin-Film Transistors

    NASA Astrophysics Data System (ADS)

    Gupta, Navneet; Tyagi, B. P.

    2005-01-01

    We propose an on-current (above threshold voltage) model of polycrystalline silicon thin-film transistors (poly-Si TFTs). The model includes the study of the effect of trap state density, poly-Si inversion layer thickness and temperature on the TFT characteristics. Effective carrier mobility and I-V characteristics are described by considering the mechanism of capture and release of carriers at grain boundary trap states and the thermionic emission theory. It is found that at low as well as at high doping concentrations, the effective carrier mobility (µeff) increases with increasing temperature whereas a dip is observed at intermediate doping concentration. At very high and very low doping concentration the effect of temperature on the mobility is found to be almost negligible. Calculations reveal that effective carrier mobility and drain current increase as the gate bias increases and are larger for a lower trap state density. The calculated value of activation energy decreases as the gate bias increases and is larger for a larger poly-Si inversion layer thickness. A comparison between the present predictions and the experimental results shows reasonably good agreement.

  2. Enhanced broadband and omni-directional performance of polycrystalline Si solar cells by using discrete multilayer antireflection coatings.

    PubMed

    Oh, Seung Jae; Chhajed, Sameer; Poxson, David J; Cho, Jaehee; Schubert, E Fred; Tark, Sung Ju; Kim, Donghwan; Kim, Jong Kyu

    2013-01-14

    The performance enhancement of polycrystalline Si solar cells by using an optimized discrete multilayer anti-reflection (AR) coating with broadband and omni-directional characteristics is presented. Discrete multilayer AR coatings are optimized by a genetic algorithm, and experimentally demonstrated by refractive-index tunable SiO₂ nano-helix arrays and co-sputtered (SiO₂)x(TiO₂)₁₋x thin film layers. The optimized multilayer AR coating shows a reduced total reflection, leading to the high incident-photon-to-electron conversion efficiency over a correspondingly wide range of wavelengths and incident angles, offering a very promising way to harvest more solar energy by virtually any type of solar cells for a longer time of a day.

  3. Beta-to-alpha transformation in polycrystalline SiC. II - Interfacial energetics

    NASA Technical Reports Server (NTRS)

    Mitchell, T. E.; Ogbuji, L. U.; Heuer, A. H.

    1978-01-01

    A phenomenological analysis of the energetics of the beta-to-alpha transformation in polycrystalline SiC is presented. It is found that the extreme anisotropy of the interfacial energy between alpha- and beta-SiC can account for the rapid growth of composite grains into the beta matrix during conventional sintering or hot-pressing processes. The composite grains consist of alpha-SiC plates 'sandwiched' between well-oriented and recrystallized beta-SiC 'envelopes'. The interfaces involving the 111 plane type of beta and (0001) of alpha have much lower energies than random beta/alpha interfaces.

  4. Improvement in pH sensitivity of low-temperature polycrystalline-silicon thin-film transistor sensors using H2 sintering.

    PubMed

    Yen, Li-Chen; Tang, Ming-Tsyr; Chang, Fang-Yu; Pan, Tung-Ming; Chao, Tien-Sheng; Lee, Chiang-Hsuan

    2014-02-25

    In this article, we report an improvement in the pH sensitivity of low-temperature polycrystalline-silicon (poly-Si) thin-film transistor (TFT) sensors using an H2 sintering process. The low-temperature polycrystalline-silicon (LTPS) TFT sensor with H2 sintering exhibited a high sensitivity than that without H2 sintering. This result may be due to the resulting increase in the number of Si-OH2(+) and Si-O(-) bonds due to the incorporation of H in the gate oxide to reduce the dangling silicon bonds and hence create the surface active sites and the resulting increase in the number of chemical reactions at these surface active sites. Moreover, the LTPS TFT sensor device not only offers low cost and a simple fabrication processes, but the technique also can be extended to integrate the sensor into other systems.

  5. Technique for measuring irradiation creep in polycrystalline SiC fibers

    SciTech Connect

    Youngblood, G.E.; Hamilton, M.L.; Jones, R.H.

    1996-10-01

    A bend stress relaxation (BSR) test has been designed to examine irradiation enhanced creep in polycrystalline SiC fibers being considered for fiber reinforcement in SiC/SiC composite. Thermal creep results on Nicalon-CG and Hi-Nicalon were shown to be consistent with previously published data with Hi-Nicalon showing about a 100{degrees}C improvement in creep resistance. Preliminary data was also obtained on Nicalon-S that demonstrated that its creep resistance is greater than that of Hi-Nicalon.

  6. Faraday effect of polycrystalline bismuth iron garnet thin film prepared by mist chemical vapor deposition method

    NASA Astrophysics Data System (ADS)

    Yao, Situ; Kamakura, Ryosuke; Murai, Shunsuke; Fujita, Koji; Tanaka, Katsuhisa

    2017-01-01

    We have synthesized polycrystalline thin film composed of a single phase of metastable bismuth iron garnet, Bi3Fe5O12, on a fused silica substrate, one of the most widely utilized substrates in the solid-state electronics, by using mist chemical vapor deposition (mist CVD) method. The phase purity and stoichiometry are confirmed by X-ray diffraction and Rutherford backscattering spectrometry. The resultant thin film shows a small surface roughness of 3.251 nm. The saturation magnetization at room temperature is 1200 G, and the Faraday rotation angle at 633 nm reaches -5.2 deg/μm. Both the magnetization and the Faraday rotation angles are somewhat higher than those of polycrystalline BIG thin films prepared by other methods.

  7. Near-infrared light absorption by polycrystalline SiSn alloys grown on insulating layers

    SciTech Connect

    Kurosawa, Masashi; Kato, Motohiro; Yamaha, Takashi; Taoka, Noriyuki; Nakatsuka, Osamu; Zaima, Shigeaki

    2015-04-27

    High-Sn-content SiSn alloys are strongly desired for the next-generation near-infrared optoelectronics. A polycrystalline growth study has been conducted on amorphous SiSn layers with a Sn-content of 2%–30% deposited on either a substrate of SiO{sub 2} or SiN. Incorporating 30% Sn into Si permits the crystallization of the amorphous layers at annealing temperatures below the melting point of Sn (231.9 °C). Composition analyses indicate that approximately 20% of the Sn atoms are substituted into the Si lattice after solid-phase crystallization at 150–220 °C for 5 h. Correspondingly, the optical absorption edge is red-shifted from 1.12 eV (Si) to 0.83 eV (Si{sub 1−x}Sn{sub x} (x ≈ 0.18 ± 0.04)), and the difference between the indirect and direct band gap is significantly reduced from 3.1 eV (Si) to 0.22 eV (Si{sub 1−x}Sn{sub x} (x ≈ 0.18 ± 0.04)). These results suggest that with higher substitutional Sn content the SiSn alloys could become a direct band-gap material, which would provide benefits for Si photonics.

  8. Polycrystalline thin film materials and devices. Final subcontract report, 16 January 1990--15 January 1993

    SciTech Connect

    Birkmire, R.W.; Phillips, J.E.; Shafarman, W.N.; Hegedus, S.S.; McCandless, B.E.; Yokimcus, T.A.

    1993-08-01

    This report describes results and conclusions of the final phase (III) of a three-year research program on polycrystalline thin-film heterojunction solar cells. The research consisted of the investigation of the relationships between processing, materials properties, and device performance. This relationship was quantified by device modeling and analysis. The analysis of thin-film polycrystalline heterojunction solar cells explains how minority-carrier recombination at the metallurgical interface and at grain boundaries can be greatly reduced by the proper doping of the window and absorber layers. Additional analysis and measurements show that the present solar cells are limited by the magnitude of the diode current, which appears to be caused by recombination in the space charge region. Developing an efficient commercial-scale process for fabricating large-area polycrystalline, thin-film solar cells from a research process requires a detailed understanding of the individual steps in making the solar cell, and their relationship to device performance and reliability. The complexities involved in characterizing a process are demonstrated with results from our research program on CuInSe{sub 2}, and CdTe processes.

  9. Simulation of electrical conduction in thin polycrystalline metallic films: Impact of microstructure

    SciTech Connect

    Rickman, J. M.; Barmak, K.

    2013-10-07

    We examine the impact of microstructural features on the electrical conductivity of a thin metallic film using Monte Carlo simulation. In particular, we obtain the dependence of the conductivity (in the absence of surface scattering) on average grain size and electron scattering mechanisms, the latter parametrized by a transmission coefficient, for a model polycrystal generated by a Voronoi tessellation. We find that the conductivity can be described in limiting cases in terms of either a simplified hopping model or a trapping model. Finally, we compare our results with the Mayadas-Shatzkes model of grain-boundary scattering and with experimental resistivity measurements for polycrystalline copper thin films.

  10. High-performance poly-Si thin film transistors with highly biaxially oriented poly-Si thin films using double line beam continuous-wave laser lateral crystallization

    NASA Astrophysics Data System (ADS)

    Yamano, Masayuki; Kuroki, Shin-Ichiro; Sato, Tadashi; Kotani, Koji

    2014-01-01

    Highly biaxially oriented poly-Si thin films were formed by double-line beam continuous-wave laser lateral crystallization (DLB-CLC). The crystallinities of the DLB-CLC poly-Si thin films were (110), (111), and (211) for the laser scan, transverse, and surface directions, respectively, and an energetically stable Σ3 grain boundary was observed to be dominant. All silicon grains were elongated in the laser scan direction and one-dimensionally very large silicon grains with lengths of more than 100 µm were fabricated. Using these biaxially oriented polycrystalline silicon (poly-Si) films, low-temperature poly-Si TFTs (LTPS-TFTs) were fabricated at low temperatures (≦550 °C) by a metal gate self-aligned process. As a result, a TFT with a high electron field effect mobility of μFE = 450 cm2 V-1 s-1 in a linear region was realized.

  11. Influence of carbon content on cold rolling and recrystallization texture in polycrystalline 3% Si-Fe

    NASA Astrophysics Data System (ADS)

    Takenaka, M.; Shingaki, Y.; Imamura, T.; Hayakawa, Y.

    2015-04-01

    The influence of carbon content on cold rolling and recrystallization texture in polycrystalline 3%Si-Fe under the relatively high rolling reduction condition has been investigated. The main component of recrystallization texture was {554}<225> orientation in ultra low carbon (ULC) 3%Si-Fe and {411}<148> orientation in low carbon (LC) 3%Si-Fe. The origin of {411}<148> recrystallization texture development in LC 3%Si-Fe is discussed in terms of the rotation of deformation twin from {100}<011> to {411}<148> orientation with the generation of the slip bands inside the neighboring matrix grain {111}<011>. The rotation axis of this crystal rotation was estimated <112> axis. Assuming the single slip system activation in BCC metal, crystal rotation around <112> axis indicates an activation of {110}<111> slip system. In terms of Schmid factor, {112}<111> slip system must be activated in {100}<011> matrix. This is not in agreement with the estimation of {110}<111> slip system activation. Detailed observation on the cold rolled sample revealed that common slip plane passed through the deformation twin and surrounding deformed matrix grains. It is considered that slip plane matching (SPM) with neighboring grains activates the lower Schmid factor slip system in deformation twin. These results suggest that not only Schmid factor but also SPM with neighboring grains should be considered to decide the active slip systems in polycrystalline metals.

  12. Giant rotating magnetocaloric effect induced by highly texturing in polycrystalline DyNiSi compound

    NASA Astrophysics Data System (ADS)

    Zhang, Hu; Li, Yawei; Liu, Enke; Ke, Yajiao; Jin, Jinling; Long, Yi; Shen, Baogen

    2015-07-01

    Large rotating magnetocaloric effect (MCE) has been observed in some single crystals due to strong magnetocrystalline anisotropy. By utilizing the rotating MCE, a new type of rotary magnetic refrigerator can be constructed, which could be more simplified and efficient than the conventional one. However, compared with polycrystalline materials, the high cost and complexity of preparation for single crystals hinder the development of this novel magnetic refrigeration technology. For the first time, here we observe giant rotating MCE in textured DyNiSi polycrystalline material, which is larger than those of most rotating magnetic refrigerants reported so far. This result suggests that DyNiSi compound could be attractive candidate of magnetic refrigerants for novel rotary magnetic refrigerator. By considering the influence of demagnetization effect on MCE, the origin of large rotating MCE in textured DyNiSi is attributed to the coexistence of strong magnetocrystalline anisotropy and highly preferred orientation. Our study on textured DyNiSi not only provides a new magnetic refrigerant with large rotating MCE for low temperature magnetic refrigeration, but also opens a new way to exploit magnetic refrigeration materials with large rotating MCE, which will be highly beneficial to the development of rotating magnetic refrigeration technology.

  13. Giant rotating magnetocaloric effect induced by highly texturing in polycrystalline DyNiSi compound.

    PubMed

    Zhang, Hu; Li, YaWei; Liu, Enke; Ke, YaJiao; Jin, JinLing; Long, Yi; Shen, BaoGen

    2015-07-10

    Large rotating magnetocaloric effect (MCE) has been observed in some single crystals due to strong magnetocrystalline anisotropy. By utilizing the rotating MCE, a new type of rotary magnetic refrigerator can be constructed, which could be more simplified and efficient than the conventional one. However, compared with polycrystalline materials, the high cost and complexity of preparation for single crystals hinder the development of this novel magnetic refrigeration technology. For the first time, here we observe giant rotating MCE in textured DyNiSi polycrystalline material, which is larger than those of most rotating magnetic refrigerants reported so far. This result suggests that DyNiSi compound could be attractive candidate of magnetic refrigerants for novel rotary magnetic refrigerator. By considering the influence of demagnetization effect on MCE, the origin of large rotating MCE in textured DyNiSi is attributed to the coexistence of strong magnetocrystalline anisotropy and highly preferred orientation. Our study on textured DyNiSi not only provides a new magnetic refrigerant with large rotating MCE for low temperature magnetic refrigeration, but also opens a new way to exploit magnetic refrigeration materials with large rotating MCE, which will be highly beneficial to the development of rotating magnetic refrigeration technology.

  14. Crystallization to polycrystalline silicon thin film and simultaneous inactivation of electrical defects by underwater laser annealing

    SciTech Connect

    Machida, Emi; Horita, Masahiro; Ishikawa, Yasuaki; Uraoka, Yukiharu; Ikenoue, Hiroshi

    2012-12-17

    We propose a low-temperature laser annealing method of a underwater laser annealing (WLA) for polycrystalline silicon (poly-Si) films. We performed crystallization to poly-Si films by laser irradiation in flowing deionized-water where KrF excimer laser was used for annealing. We demonstrated that the maximum value of maximum grain size of WLA samples was 1.5 {mu}m, and that of the average grain size was 2.8 times larger than that of conventional laser annealing in air (LA) samples. Moreover, WLA forms poly-Si films which show lower conductivity and larger carrier life time attributed to fewer electrical defects as compared to LA poly-Si films.

  15. Crystallization to polycrystalline silicon thin film and simultaneous inactivation of electrical defects by underwater laser annealing.

    PubMed

    Machida, Emi; Horita, Masahiro; Ishikawa, Yasuaki; Uraoka, Yukiharu; Ikenoue, Hiroshi

    2012-12-17

    We propose a low-temperature laser annealing method of a underwater laser annealing (WLA) for polycrystalline silicon (poly-Si) films. We performed crystallization to poly-Si films by laser irradiation in flowing deionized-water where KrF excimer laser was used for annealing. We demonstrated that the maximum value of maximum grain size of WLA samples was 1.5 μm, and that of the average grain size was 2.8 times larger than that of conventional laser annealing in air (LA) samples. Moreover, WLA forms poly-Si films which show lower conductivity and larger carrier life time attributed to fewer electrical defects as compared to LA poly-Si films.

  16. Study of microstructural and optical properties of a-Si:H thin films

    NASA Astrophysics Data System (ADS)

    Jurečka, Stanislav; Müllerová, Jarmila

    2010-12-01

    Undoped amorphous silicon thin films pasivated by hydrogen (a-Si:H) are important for a number of industrial and research applications, especially for optoelectronics, photovoltaics, optical communications, senzorics, laser technology and so on. We experimentally studied properties of the a-Si:H thin films prepared by the plasma-enhanced chemical vapour deposition (PECVD) method. Sample microstructure properties and the effect of the microstructure on optical properties of the a-Si:H thin films deposited by PECVD on glass were analysed. The spectral refractive index, extinction coefficient, and surface morphology were analysed for the series of a-Si:H samples prepared in different technological conditions from H diluted silane plasma. Surface morphology of studied samples was described by the atomic force microscopy (AFM) method. Optical properties of a-Si:H thin films were analysed by numerical optimization of the microstructural and dispersion model of optical parameters relative to the experimental spectral reflectance. The results show that at dilution between 20 and 30 the transition between amorphous and polycrystalline phase occurs. The sample becomes a mixture of amorphous and polycrystalline phase with nano-sized grains and voids with decreasing hydrogen concentration.

  17. High-performance polycrystalline silicon thin-film transistors with two-dimensional location control of the grain boundary via excimer laser crystallization.

    PubMed

    Wang, Chao-Lung; Lee, I-Che; Wu, Chun-Yu; Liao, Chan-Yu; Cheng, Yu-Ting; Cheng, Huang-Chung

    2012-07-01

    High-performance low-temperature polycrystalline silicon (Poly-Si) thin-film transistors (TFTs) have been fabricated with two-dimensional (2-D) location-controlled grain boundaries using excimer laser crystallization (ELC). By locally increased thickness of the amorphous silicon (a-Si) film that was served as the seed crystals with a partial-melting crystallization scheme, the cross-shaped grain boundary structures were produced between the thicker a-Si grids. The Poly-Si TFTs with one parallel and one perpendicular grain boundary along the channel direction could therefore be fabricated to reach excellent field-effect mobility of 530 cm2/V-s while the conventional ones exhibited field-effect mobility of 198 cm2/V-s. Furthermore, the proposed TFTs achieved not only superior electric properties but also improved uniformity as compared with the conventional ones owing to the artificially controlled locations of grain boundaries.

  18. The Impact of Standard Semiconductor Fabrication Processes on Polycrystalline Nb Thin Film Surfaces

    NASA Technical Reports Server (NTRS)

    Brown, Ari David; Barrentine, Emily M.; Moseley, Samuel H.; Noroozian, Omid; Stevenson, Thomas

    2016-01-01

    Polycrystalline Nb thin films are extensively used for microwave kinetic inductance detectors (MKIDs) and superconducting transmission line applications. The microwave and mm-wave loss in these films is impacted, in part, by the presence of surface nitrides and oxides. In this study, glancing incidence x-ray diffraction was used to identify the presence of niobium nitride and niobium monoxide surface layers on Nb thin films which had been exposed to chemicals used in standard photolithographic processing. A method of mitigating the presence of ordered niobium monoxide surface layers is presented. Furthermore, we discuss the possibility of using glancing incidence x-ray diffraction as a non-destructive diagnostic tool for evaluating the quality of Nb thin films used in MKIDs and transmission lines. For a given fabrication process, we have both the X-ray diffraction data of the surface chemistry and a measure of the mm-wave and microwave loss, the latter being made in superconducting resonators.

  19. An inert marker study for palladium silicide formation - Si moves in polycrystalline Pd2Si

    NASA Technical Reports Server (NTRS)

    Ho, K. T.; Lien, C.-D.; Shreter, U.; Nicolet, M.-A.

    1985-01-01

    A novel use of Ti marker is introduced to investigate the moving species during Pd2Si formation on 111 and 100 line-type Si substrates. Silicide formed from amorphous Si is also studied using a W marker. Although these markers are observed to alter the silicide formation in the initial stage, the moving species can be identified once a normal growth rate is resumed. It is found that Si is the dominant moving species for all three types of Si crystallinity. However, Pd will participate in mass transport when Si motion becomes obstructed.

  20. Selective assembling of calixarenes and pseudorotaxanes on Si(100) and polycrystalline copper.

    PubMed

    Boccia, Alice; Lanzilotto, Valeria; Di Castro, Valeria; Zanoni, Robertino; Arduini, Arturo; Pescatori, Luca; Secchi, Andrea

    2011-10-01

    We report the first compared study of the anchoring mode of calix[6]arene derivatives and pseudorotaxanes on Si(100) and polycrystalline Cu. Calixarenes have been chosen for their flexibility as linkers, being, i.a., efficient building blocks for the constructing of molecular devices based on pseudorotaxanes and rotaxanes. A covalent functionalization on Si or Cu surfaces requires the molecules to be differently modified: thiol (-SH) or C double bond C terminations are respectively suitable for Cu or H-Si(100). Anchoring on Cu was reached by dipping a clean substrate in a calix[6]arene-SH solution, while a wet-chemistry recipe was followed for Si(100), combined with an extra-mild photochemical activation via visible light. Molecular adhesion onto either surfaces has been demonstrated by the presence of XPS signals from specific elements in the molecules: calix[6]arene designed for H-Si were derivatized with NO2 groups on the upper rim of the calix, while the S atom was used as the molecular identifier on Cu. A further extension is represented by the anchoring reaction of rotaxanes on Si(100) and Cu surfaces. A pseudorotaxane species was first formed in solution by reacting a calix[6]arene "wheel," bearing three N-phenylureido groups on the upper rim, with viologen (4,4'-bipyridinium) containing axle. The resulting species has then been anchored on either Cu and Si via its distinct termination of the axle. This two-step reaction has produced a threaded pseudorotaxane covalently bound to either surfaces, as shown by XPS results. These species are ready to respond to external stimuli. We also cross-checked the two different anchoring groups for their reactivity on Cu and Si surfaces. No molecular uptake was observed when two solutions, containing calixarenes with the anchoring arms intended either for Si or Cu surfaces, were exchanged.

  1. Charge transport in polycrystalline silicon thin-films on glass substrates

    NASA Astrophysics Data System (ADS)

    Scheller, L.-P.; Nickel, N. H.

    2012-07-01

    Charge carrier transport in solid-phase crystallized polycrystalline silicon (poly-Si) was investigated as a function of the deposition temperature, Td, the amorphous starting material and the used substrates. The samples were characterized using temperature dependent transport measurements to determine the carrier concentration, mobility, and conductivity. Samples prepared on a-SiN:H covered borofloat glass exhibit a low carrier concentration that is independent of Td. In these samples, charge transport is dominated by intra-grain scattering mechanisms. In contrast, when poly-Si is prepared on corning glass, the carrier concentration shows an inverted U-shape behavior with increasing deposition temperature. The Hall mobility is thermally activated, which is consistent with thermionic carrier emission over potential energy barriers. The change of the activation energy with experimental parameters is accompanied by a large change of the exponential prefactor by more than 4 orders of magnitude. This is indicative of a Meyer-Neldel behavior. Moreover, at low temperatures, the conductivity deviates from an activated behavior indicating hopping transport with a mean hopping distance of ≈140 Å and an energy difference of ≈82 meV between the participating states. To derive insight into the underlying transport mechanisms and to determine information on barrier energy heights and grain-boundary defect-densities, the experimental data were analyzed employing transport models for polycrystalline materials.

  2. High photocurrent polycrystalline thin-film CdS/CuInSe2 solar cell

    NASA Astrophysics Data System (ADS)

    Mickelsen, R. A.; Chen, W. S.

    1980-03-01

    A polycrystalline thin-film CdS/CuInSe2 heterojunction solar cell with an efficiency of 5.7% has been prepared using a simultaneous elemental evaporation technique to deposit the CuInSe2 film. The cell's short-circuit current of 31 mA/sq cm under 100 mW/sq cm is the highest ever reported for a 1-sq-cm cell. Heat treatments have been found to improve cell efficiency and to also change the cell I-V and C-V characteristics.

  3. Optical and electrical properties of polycrystalline and amorphous Al-Ti thin films

    NASA Astrophysics Data System (ADS)

    Canulescu, S.; Borca, C. N.; Rechendorff, K.; Davidsdóttir, S.; Pagh Almtoft, K.; Nielsen, L. P.; Schou, J.

    2016-04-01

    The structural, optical, and transport properties of sputter-deposited Al-Ti thin films have been investigated as a function of Ti alloying with a concentration ranging from 2% to 46%. The optical reflectivity of Al-Ti films at visible and near-infrared wavelengths decreases with increasing Ti content. X-ray absorption fine structure measurements reveal that the atomic ordering around Ti atoms increases with increasing Ti content up to 20% and then decreases as a result of a transition from a polycrystalline to amorphous structure. The transport properties of the Al-Ti films are influenced by electron scattering at the grain boundaries in the case of polycrystalline films and static defects, such as anti-site effects and vacancies in the case of the amorphous alloys. The combination of Ti having a real refractive index (n) comparable with the extinction coefficient (k) and Al with n much smaller than k allows us to explore the parameter space for the free-electron behavior in transition metal-Al alloys. The free electron model, applied for the polycrystalline Al-Ti films with Ti content up to 20%, leads to an optical reflectance at near infrared wavelengths that scales linearly with the square root of the electrical resistivity.

  4. Polycrystalline Silicon Thin-film Solar cells with Plasmonic-enhanced Light-trapping

    PubMed Central

    Varlamov, Sergey; Rao, Jing; Soderstrom, Thomas

    2012-01-01

    conditions. An optimised nanoparticle array alone results in cell Jsc enhancement of about 28%, similar to the effect of the diffuse reflector. The photocurrent can be further increased by coating the nanoparticles by a low refractive index dielectric, like MgF2, and applying the diffused reflector. The complete plasmonic cell structure comprises the polycrystalline silicon film, a silver nanoparticle array, a layer of MgF2, and a diffuse reflector. The Jsc for such cell is 21-23 mA/cm2, up to 45% higher than Jsc of the original cell without light-trapping or ~25% higher than Jsc for the cell with the diffuse reflector only. Introduction Light-trapping in silicon solar cells is commonly achieved via light scattering at textured interfaces. Scattered light travels through a cell at oblique angles for a longer distance and when such angles exceed the critical angle at the cell interfaces the light is permanently trapped in the cell by total internal reflection (Animation 1: Light-trapping). Although this scheme works well for most solar cells, there are developing technologies where ultra-thin Si layers are produced planar (e.g. layer-transfer technologies and epitaxial c-Si layers) 1 and or when such layers are not compatible with textures substrates (e.g. evaporated silicon) 2. For such originally planar Si layer alternative light trapping approaches, such as diffuse white paint reflector 3, silicon plasma texturing 4 or high refractive index nanoparticle reflector 5 have been suggested. Metal nanoparticles can effectively scatter incident light into a higher refractive index material, like silicon, due to the surface plasmon resonance effect 6. They also can be easily formed on the planar silicon cell surface thus offering a light-trapping approach alternative to texturing. For a nanoparticle located at the air-silicon interface the scattered light fraction coupled into silicon exceeds 95% and a large faction of that light is scattered at angles above critical providing

  5. Structural characterization and optical properties of Sol-gel-derived polycrystalline Pb(Zr0.35Ti0.65)O3 thin films

    NASA Astrophysics Data System (ADS)

    Zhang, Fan; Zhang, Rong Jun; Wang, Zi Yi; Zheng, Yu Xiang; Wang, Song You; Zhao, Hai Bin; Chen, Liang Yao; Liu, Xiao Bin; Jiang, An Quan

    2013-07-01

    Polycrystalline Pb(Zr0.35Ti0.65)O3 thin films prepared on Pt/Ti/SiO2/Si substrate by using solgel technique were characterized by using X-ray diffraction (XRD) and atomic force microscopy (AFM). The optical properties of the films were investigated by using spectroscopic ellipsometry (SE) with a four-phase optical model, air/roughness layer/PZT layer/Pt layer in the spectral range of 300-800 nm. The optical band gap of the films calculated following the Tauc's Law was smaller than that of an amorphous PZT thin film with some microcrystals existing on the surface. The result indicates that the quantum-size effect leads to an increase in band gap when the crystalline dimensions become very small.

  6. Evaluation of Electrical Characteristics and Trap-State Density in Bottom-Gate Polycrystalline Thin Film Transistors Processed with High-Pressure Water Vapor Annealing

    NASA Astrophysics Data System (ADS)

    Kunii, Masafumi

    2006-02-01

    This paper discusses electrical characteristics and trap-state density in polycrystalline silicon (poly-Si) used in bottom-gate poly-Si thin film transistors (TFTs) processed with high-pressure water vapor annealing (HWA). The threshold voltage uniformity of the HWA-processed TFTs is improved by 42% for N-channel and 38% for P-channel TFTs in terms of standard deviation, and carrier mobility is enhanced by 10% or greater for both N- and P-channel TFTs than those TFTs processed conventionally. Subthreshold swing is also improved by HWA, showing that HWA postannealing is effective for improving the Si/SiO2 interface of the bottom-gate TFTs. Two types of TFTs having different poly-Si crystallinities are examined to investigate carrier transport in poly-Si processed by HWA postannealing. The evaluation of trap-state density for the two types of poly-Si reveals that HWA postannealing is more efficient for N-channel than for P-channel TFTs. Furthermore, HWA postannealing is more effective for poly-Si with high crystallinity to improve TFT characteristics. The analysis of the trap-state distributions and the activation energy of TFT drain current indicate that HWA deactivates dangling bonds highly localized at poly-Si grain boundaries (GBs). Thus, HWA postannealing effects can be interpreted by a GB barrier potential model similar to that applied to conventional hydrogenation.

  7. Low temperature deposition of polycrystalline silicon thin films on a flexible polymer substrate by hot wire chemical vapor deposition

    NASA Astrophysics Data System (ADS)

    Lee, Sang-hoon; Jung, Jae-soo; Lee, Sung-soo; Lee, Sung-bo; Hwang, Nong-moon

    2016-11-01

    For the applications such as flexible displays and solar cells, the direct deposition of crystalline silicon films on a flexible polymer substrate has been a great issue. Here, we investigated the direct deposition of polycrystalline silicon films on a polyimide film at the substrate temperature of 200 °C. The low temperature deposition of crystalline silicon on a flexible substrate has been successfully made based on two ideas. One is that the Si-Cl-H system has a retrograde solubility of silicon in the gas phase near the substrate temperature. The other is the new concept of non-classical crystallization, where films grow by the building block of nanoparticles formed in the gas phase during hot-wire chemical vapor deposition (HWCVD). The total amount of precipitation of silicon nanoparticles decreased with increasing HCl concentration. By adding HCl, the amount and the size of silicon nanoparticles were reduced remarkably, which is related with the low temperature deposition of silicon films of highly crystalline fraction with a very thin amorphous incubation layer. The dark conductivity of the intrinsic film prepared at the flow rate ratio of RHCl=[HCl]/[SiH4]=3.61 was 1.84×10-6 Scm-1 at room temperature. The Hall mobility of the n-type silicon film prepared at RHCl=3.61 was 5.72 cm2 V-1s-1. These electrical properties of silicon films are high enough and could be used in flexible electric devices.

  8. Impact of universal mobility law on polycrystalline organic thin-film transistors

    NASA Astrophysics Data System (ADS)

    Raja, Munira; Donaghy, David; Myers, Robert; Eccleston, Bill

    2012-10-01

    We have developed novel analytical models for polycrystalline organic thin-film transistor (OTFT) by employing new concepts on the charge carrier injection to polysilicon thin-films. The models, also incorporate the effect of contact resistance associated with the poor ohmic nature of the contacts. The drain current equations of the OTFT, both in the quasi-diffusion and quasi-drift regimes, predict temperature dependencies on essential material and device parameters. Interestingly, under the drift regime, the polycrystalline OTFT model reveals similar power dependencies on the applied voltages, to those of purely disordered model developed by utilizing the universal mobility law (UML). Such similarities are not thought to be coincidental since the effect of gate voltage on surface potential is influenced by the Fermi level pinning in the grain boundary. Nonetheless, the best fits on the data of 6,13-bis(tri-isopropylsilylethynyl) OTFTs are attained with the proposed polycrystalline rather than the disordered model, particularly at low gate voltages where the diffusive component is dominant. Moreover, in order to understand the effect of grain boundaries, we devise a relationship for the dependency of the effective mobility on carrier concentration, assuming a crystalline region to be in direct contact with a disordered region. Interestingly, we find a similar dependency as the UML in purely disordered materials, which further signifies the conduction to be limited by the grain boundaries. Subsequently, an analytical model for the variation of the effective mobility with gate voltage is established. Such models are vital in assisting the development of more accurate designs of the novel organic circuits.

  9. Compressive intrinsic stress originates in the grain boundaries of dense refractory polycrystalline thin films

    SciTech Connect

    Magnfält, D. Sarakinos, K.; Fillon, A.; Abadias, G.; Boyd, R. D.; Helmersson, U.

    2016-02-07

    Intrinsic stresses in vapor deposited thin films have been a topic of considerable scientific and technological interest owing to their importance for functionality and performance of thin film devices. The origin of compressive stresses typically observed during deposition of polycrystalline metal films at conditions that result in high atomic mobility has been under debate in the literature in the course of the past decades. In this study, we contribute towards resolving this debate by investigating the grain size dependence of compressive stress magnitude in dense polycrystalline Mo films grown by magnetron sputtering. Although Mo is a refractory metal and hence exhibits an intrinsically low mobility, low energy ion bombardment is used during growth to enhance atomic mobility and densify the grain boundaries. Concurrently, the lateral grain size is controlled by using appropriate seed layers on which Mo films are grown epitaxially. The combination of in situ stress monitoring with ex situ microstructural characterization reveals a strong, seemingly linear, increase of the compressive stress magnitude on the inverse grain size and thus provides evidence that compressive stress is generated in the grain boundaries of the film. These results are consistent with models suggesting that compressive stresses in metallic films deposited at high homologous temperatures are generated by atom incorporation into and densification of grain boundaries. However, the underlying mechanisms for grain boundary densification might be different from those in the present study where atomic mobility is intrinsically low.

  10. Compressive intrinsic stress originates in the grain boundaries of dense refractory polycrystalline thin films

    NASA Astrophysics Data System (ADS)

    Magnfält, D.; Fillon, A.; Boyd, R. D.; Helmersson, U.; Sarakinos, K.; Abadias, G.

    2016-02-01

    Intrinsic stresses in vapor deposited thin films have been a topic of considerable scientific and technological interest owing to their importance for functionality and performance of thin film devices. The origin of compressive stresses typically observed during deposition of polycrystalline metal films at conditions that result in high atomic mobility has been under debate in the literature in the course of the past decades. In this study, we contribute towards resolving this debate by investigating the grain size dependence of compressive stress magnitude in dense polycrystalline Mo films grown by magnetron sputtering. Although Mo is a refractory metal and hence exhibits an intrinsically low mobility, low energy ion bombardment is used during growth to enhance atomic mobility and densify the grain boundaries. Concurrently, the lateral grain size is controlled by using appropriate seed layers on which Mo films are grown epitaxially. The combination of in situ stress monitoring with ex situ microstructural characterization reveals a strong, seemingly linear, increase of the compressive stress magnitude on the inverse grain size and thus provides evidence that compressive stress is generated in the grain boundaries of the film. These results are consistent with models suggesting that compressive stresses in metallic films deposited at high homologous temperatures are generated by atom incorporation into and densification of grain boundaries. However, the underlying mechanisms for grain boundary densification might be different from those in the present study where atomic mobility is intrinsically low.

  11. Schottky Barrier Thin Film Transistor (SB-TFT) on low-temperature polycrystalline silicon

    NASA Astrophysics Data System (ADS)

    De Iacovo, A.; Ferrone, A.; Colace, L.; Minotti, A.; Maiolo, L.; Pecora, A.

    2016-12-01

    We report on the fabrication and characterization of Schottky barrier transistors on polycrystalline silicon. The transistors were realized exploiting Cr-Si and Ti-Si Schottky barrier with a low thermal budget process, compatible with polymeric, ultraflexible substrates. We obtained devices with threshold voltages as low as 1.7 V (for n channel) and 4 V (for p channel) with channel lengths ranging from 2 to 40 μm. Resulting on/off ratios are as high as 5 · 103. The devices showed threshold voltages and subthreshold slopes comparable with already published N- and P-MOS devices realized with the same process on polyimide substrates thus representing a cheaper and scalable alternative to ultraflexible transistors with doped source and drain.

  12. Mixed Al and Si doping in ferroelectric HfO2 thin films

    NASA Astrophysics Data System (ADS)

    Lomenzo, Patrick D.; Takmeel, Qanit; Zhou, Chuanzhen; Chung, Ching-Chang; Moghaddam, Saeed; Jones, Jacob L.; Nishida, Toshikazu

    2015-12-01

    Ferroelectric HfO2 thin films 10 nm thick are simultaneously doped with Al and Si. The arrangement of the Al and Si dopant layers within the HfO2 greatly influences the resulting ferroelectric properties of the polycrystalline thin films. Optimizing the order of the Si and Al dopant layers led to a remanent polarization of ˜20 μC/cm2 and a coercive field strength of ˜1.2 MV/cm. Post-metallization anneal temperatures from 700 °C to 900 °C were used to crystallize the Al and Si doped HfO2 thin films. Grazing incidence x-ray diffraction detected differences in peak broadening between the mixed Al and Si doped HfO2 thin films, indicating that strain may influence the formation of the ferroelectric phase with variations in the dopant layering. Endurance characteristics show that the mixed Al and Si doped HfO2 thin films exhibit a remanent polarization greater than 15 μC/cm2 up to 108 cycles.

  13. Mixed Al and Si doping in ferroelectric HfO{sub 2} thin films

    SciTech Connect

    Lomenzo, Patrick D.; Nishida, Toshikazu; Takmeel, Qanit; Zhou, Chuanzhen; Chung, Ching-Chang; Jones, Jacob L.; Moghaddam, Saeed

    2015-12-14

    Ferroelectric HfO{sub 2} thin films 10 nm thick are simultaneously doped with Al and Si. The arrangement of the Al and Si dopant layers within the HfO{sub 2} greatly influences the resulting ferroelectric properties of the polycrystalline thin films. Optimizing the order of the Si and Al dopant layers led to a remanent polarization of ∼20 μC/cm{sup 2} and a coercive field strength of ∼1.2 MV/cm. Post-metallization anneal temperatures from 700 °C to 900 °C were used to crystallize the Al and Si doped HfO{sub 2} thin films. Grazing incidence x-ray diffraction detected differences in peak broadening between the mixed Al and Si doped HfO{sub 2} thin films, indicating that strain may influence the formation of the ferroelectric phase with variations in the dopant layering. Endurance characteristics show that the mixed Al and Si doped HfO{sub 2} thin films exhibit a remanent polarization greater than 15 μC/cm{sup 2} up to 10{sup 8} cycles.

  14. Appropriate materials and preparation techniques for polycrystalline-thin-film thermophotovoltaic cells

    NASA Astrophysics Data System (ADS)

    Dhere, Neelkanth G.

    1997-03-01

    Polycrystalline-thin-film thermophotovoltaic (TPV) cells have excellent potential for reducing the cost of TPV generators so as to address the hitherto inaccessible and highly competitive markets such as self-powered gas-fired residential warm air furnaces and energy-efficient electric cars, etc. Recent progress in polycrystalline-thin-film solar cells have made it possible to satisfy the diffusion length and intrinsic junction rectification criteria for TPV cells operating at high fluences. Continuous ranges of direct bandgaps of the ternary and pseudoternary compounds such as Hg1-xCdxTe, Pb1-xCdxTe, Hg1-xZnxTe, and Pb1-xZnxS cover the region of interest of 0.50-0.75 eV for efficient TPV conversion. Other ternary and pseudoternary compounds which show direct bandgaps in most of or all of the 0.50-0.75 eV range are Pb1-xZnxTe, Sn1-xCd2xTe2, Pb1-xCdxSe, Pb1-xZnxSe, and Pb1-xCdxS. Hg1-xCdxTe (with x~0.21) has been studied extensively for infrared detectors. PbTe and Pb1-xSnxTe have also been studied for infrared detectors. Not much work has been carried out on Hg1-xZnxTe thin films. Hg1-xCdxTe and Pb1-xCdxTe alloys cover a wide range of cut-off wavelengths from the far infrared to the near visible. Acceptors and donors are introduced in these materials by excess non-metal (Te) and excess metal (Hg and Pb) respectively. Extrinsic acceptor impurities are Cu, Au, and As while and In and Al are donor impurities. Hg1-xCdxTe thin films have been deposited by isothermal vapor-phase epitaxy (VPE), liquid phase epitaxy (LPE), hot-wall metalorganic chemical vapor deposition (MOCVD), electrodeposition, sputtering, molecular beam epitaxy (MBE), laser-assisted evaporation, and vacuum evaporation with or without hot-wall enclosure. The challenge in the preparation of Hg1-xCdxTe is to provide excess mercury incidence rate, to optimize the deposition parameters for enhanced mercury incorporation, and to achieve the requisite stoichiometry, grain size, and doping. MBE and MOCVD

  15. Record Low Thermal Conductivity of Polycrystalline Si Nanowire: Breaking the Casimir Limit by Severe Suppression of Propagons.

    PubMed

    Zhou, Yanguang; Hu, Ming

    2016-10-12

    Thermoelectrics offer an attractive pathway for addressing an important niche in the globally growing landscape of energy demand. Nanoengineering existing low-dimensional thermoelectric materials pertaining to realizing fundamentally low thermal conductivity has emerged as an efficient route to achieve high energy conversion performance for advanced thermoelectrics. In this paper, by performing nonequilibrium and Green-Kubo equilibrium molecular dynamics simulations we report that the thermal conductivity of Si nanowires (NWs) in polycrystalline form can reach a record low value substantially below the Casimir limit, a theory of diffusive boundary limit that regards the direction-averaged mean free path is limited by the characteristic size of the nanostructures. The astonishingly low thermal conductivity of polycrystalline Si NW is 269 and 77 times lower with respect to that of bulk Si and pristine Si NW, respectively, and is even only about one-third of the value of the purely amorphous Si NW at room temperature. By examining the mode level phonon behaviors including phonon group velocities, lifetime, and so forth, we identify the mechanism of breaking the Casimir limit as the strong localization of the middle and high frequency phonon modes, which leads to a prominent decrease of effective mean free path of the heat carriers including both propagons and diffusons. The contribution of the propagons to the overall thermal transport is further quantitatively characterized and is found to be dramatically suppressed in polycrystalline Si NW form as compared with bulk Si, perfect Si NW, and pure amorphous Si NW. Consequently, the diffusons, which transport the heat through overlap with other vibrations, carry the majority of the heat in polycrystalline Si NWs. We also proposed approach of introducing "disorder" in the polycrystalline Si NWs that could eradicate the contribution of propagons to achieve an even lower thermal conductivity than that ever thought possible

  16. Effects of gate insulator using high pressure annealing on the characteristics of solid phase crystallized polycrystalline silicon thin-film transistors

    NASA Astrophysics Data System (ADS)

    Kim, Moojin; Jin, GuangHai

    2009-04-01

    The oxidizing ambient was built using high pressure H2O vapor at 550 °C. For the solid phase crystallization (SPC) polycrystalline silicon (poly-Si) that is annealed for 1 h at 2 MPa, the oxide thickness is about 150 Å. The oxide layer is approximately 90 Å above the original surface of the poly-Si and 60 Å below the original surface. The oxide layer is used as the first gate insulator layer of thin-film transistors (TFTs). The heating at 550 °C with 2 MPa H2O vapor increased the carrier mobility from 17.6 cm2/V s of the conventional SPC process to 30.4 cm2/V s, and it reduced the absolute value of the threshold voltage (Vth) from 4.13 to 3.62 V. The subthreshold swing also decreased from 0.72 to 0.60 V/decade. This improvement is attributed mainly to the reduction in defect density at the oxide/poly-Si interface and in the poly-Si film by the high pressure annealing (HPA) process. Since the realization of excellent performance at the oxide/poly-Si interface and in poly-Si depends on the defect density, the poly-Si having the thermal oxide formed by a combined process of SPC and HPA may be well suited for fabrication of poly-Si TFTs for flat panel displays such as active matrix organic light emitting diodes.

  17. Mechanical behavior of polycrystalline ceramics: Brittle fracture of SiC-Si3N4 materials

    NASA Technical Reports Server (NTRS)

    Ceipold, M. H.; Kapadia, C. M.; Kelkar, A. H.

    1972-01-01

    Research on the fracture behavior of silicon nitride and silicon carbide is reported along with the role of anion impurities in the fabrication and behavior of magnesium oxide. The results of a survey of crack propagation in SiC and Si3N4 are presented. Studies in the following areas are reported: development of a fracture toughness testing technique, constant moment beam, microcrack examination, and etching techniques.

  18. Large exchange-bias in Ni55Mn19Al24Si2 polycrystalline ribbons

    NASA Astrophysics Data System (ADS)

    Singh, Rohit; Ingale, Babita; Varga, Lajos K.; Khovaylo, Vladimir V.; Chatterjee, Ratnamala

    2014-09-01

    The crystal structure, phase transition and exchange bias effect in induction melted polycrystalline ribbons of Ni55Mn19Al24Si2 have been studied using room temperature x-ray diffraction (XRD), differential scanning calorimetry (DSC) and magnetic measurements. The sample was found to show structural transformation temperatures such as austenite start (As)=306 K, austenite finish (Af)=316 K, martensite start (Ms)=305 K and martensite finish (Mf)=294 K all above room temperature. The room temperature structure evaluated as orthorhombic 14 M with lattice parameters a=4.14 Å, b=29.84 Å, and c=5.72 Å. Importantly at 2 K, the sample showed a large exchange bias field of about 2520 Oe, which is the maximum value ever reported among the Heusler alloy samples.

  19. Tailoring of in-plane magnetic anisotropy in polycrystalline cobalt thin films by external stress

    NASA Astrophysics Data System (ADS)

    Kumar, Dileep; Singh, Sadhana; Vishawakarma, Pramod; Dev, Arun Singh; Reddy, V. R.; Gupta, Ajay

    2016-11-01

    Polycrystalline Co films of nominal thickness ~180 Å were deposited on intentionally curved Si substrates. Tensile and compressive stresses of 100 MPa and 150 MPa were induced in the films by relieving the curvature. It has been found that, within the elastic limit, presence of stress leads to an in-plane magnetic anisotropy in the film and its strength increases with increasing stress. Easy axis of magnetization in the films is found to be parallel/ transverse to the compressive /tensile stresses respectively. The origin of magnetic anisotropy in the stressed films is understood in terms of magneto- elastic coupling, where the stress try to align the magnetic moments in order to minimize the magneto-elastic as well as anisotropy energy. Tensile stress is also found to be responsible for the surface smoothening of the films, which is attributed to the movement of the atoms associated with the applied stress. The present work provides a possible way to tailor the magnetic anisotropy and its direction in polycrystalline and amorphous films using external stress.

  20. Abnormal Threshold Voltage Shifts in P-Channel Low-Temperature Polycrystalline Silicon Thin Film Transistors Under Negative Bias Temperature Stress.

    PubMed

    Kim, Sang Sub; Choi, Pyung Ho; Baek, Do Hyun; Lee, Jae Hyeong; Choi, Byoung Deog

    2015-10-01

    In this research, we have investigated the instability of P-channel low-temperature polycrystalline silicon (poly-Si) thin-film transistors (LTPS TFTs) with double-layer SiO2/SiNx dielectrics. A negative gate bias temperature instability (NBTI) stress was applied and a turn-around behavior phenomenon was observed in the Threshold Voltage Shift (Vth). A positive threshold voltage shift occurs in the first stage, resulting from the negative charge trapping at the SiNx/SiO2 dielectric interface being dominant over the positive charge trapping at dielectric/Poly-Si interface. Following a stress time of 7000 s, the Vth switches to the negative voltage direction, which is "turn-around" behavior. In the second stage, the Vth moves from -1.63 V to -2 V, overwhelming the NBTI effect that results in the trapping of positive charges at the dielectric/Poly-Si interface states and generating grain-boundary trap states and oxide traps.

  1. Process for fabricating polycrystalline semiconductor thin-film solar cells, and cells produced thereby

    DOEpatents

    Wu, Xuanzhi; Sheldon, Peter

    2000-01-01

    A novel, simplified method for fabricating a thin-film semiconductor heterojunction photovoltaic device includes initial steps of depositing a layer of cadmium stannate and a layer of zinc stannate on a transparent substrate, both by radio frequency sputtering at ambient temperature, followed by the depositing of dissimilar layers of semiconductors such as cadmium sulfide and cadmium telluride, and heat treatment to convert the cadmium stannate to a substantially single-phase material of a spinel crystal structure. Preferably, the cadmium sulfide layer is also deposited by radio frequency sputtering at ambient temperature, and the cadmium telluride layer is deposited by close space sublimation at an elevated temperature effective to convert the amorphous cadmium stannate to the polycrystalline cadmium stannate with single-phase spinel structure.

  2. Metastable Electrical Characteristics of Polycrystalline Thin-Film Photovoltaic Modules upon Exposure and Stabilization: Preprint

    SciTech Connect

    Deline, C. A.; del Cueto, J. A.; Albin, D. S.; Rummel, S. R.

    2011-09-01

    The significant features of a series of stabilization experiments conducted at the National Renewable Energy Laboratory (NREL) between May 2009 and the present are reported. These experiments evaluated a procedure to stabilize the measured performance of thin-film polycrystalline cadmium telluride (CdTe) and copper indium gallium diselenide (CIGS) thin-film photovoltaic (PV) modules. The current-voltage (I-V) characteristics of CdTe and CIGS thin-film PV devices and modules exhibit transitory changes in electrical performance after thermal exposure in the dark and/or bias and light exposures. We present the results of our case studies of module performance versus exposure: light-soaked at 65 degrees C; exposed in the dark under forward bias at 65 degrees C; and, finally, longer-term outdoor exposure. We find that stabilization can be achieved to varying degrees using either light-soaking or dark bias methods and that the existing IEC 61646 light-soaking interval may be appropriate for CdTe and CIGS modules with one caveat: it is likely that at least three exposure intervals are required for stabilization.

  3. The Impact of Standard Semiconductor Fabrication Processes on Polycrystalline Nb Thin Film Surfaces

    NASA Technical Reports Server (NTRS)

    Brown, Ari David; Barrentine, Emily M.; Moseley, Samuel H.; Noroozian, Omid; Stevenson, Thomas

    2011-01-01

    Polycrystalline superconducting Nb thin films are extensively used for submillimeter and millimeter transmission line applications and, less commonly, used in microwave kinetic inductance detector (MKID) applications. The microwave and mm-wave loss in these films is impacted, in part, by the presence of surface nitrides and oxides. In this study, glancing incidence x-ray diffraction was used to identify the presence of niobium nitride and niobium monoxide surface layers on Nb thin films which had been exposed to chemicals used in standard photolithographic processing. A method of mitigating the presence of ordered niobium monoxide surface layers is presented. Furthermore, we discuss the possibility of using glancing incidence x-ray diffraction as a non-destructive diagnostic tool for evaluating the quality of Nb thin films used in MKIDs and transmission lines. For a given fabrication process, we have both the x-ray diffraction data of the surface chemistry and a measure of the mm-wave and microwave loss, the latter being made in superconducting resonators.

  4. Metastable electrical characteristics of polycrystalline thin-film photovoltaic modules upon exposure and stabilization

    NASA Astrophysics Data System (ADS)

    Deline, Chris A.; del Cueto, Joseph A.; Albin, David S.; Rummel, Steve R.

    2011-09-01

    The significant features of a series of stabilization experiments conducted at the National Renewable Energy Laboratory (NREL) between May 2009 and the present are reported. These experiments evaluated a procedure to stabilize the measured performance of thin-film polycrystalline cadmium telluride (CdTe) and copper indium gallium diselenide (CIGS) thin-film photovoltaic (PV) modules. The current-voltage (I-V) characteristics of CdTe and CIGS thin-film PV devices and modules exhibit transitory changes in electrical performance after thermal exposure in the dark and/or bias and light exposures. We present the results of our case studies of module performance versus exposure: light-soaked at 65°C exposed in the dark under forward bias at 65°C and, finally, longer-term outdoor exposure. We find that stabilization can be achieved to varying degrees using either light-soaking or dark bias methods and that the existing IEC 61646 light-soaking interval may be appropriate for CdTe and CIGS modules with one caveat: it is likely that at least three exposure intervals are required for stabilization.

  5. Controllability of self-aligned four-terminal planar embedded metal double-gate low-temperature polycrystalline-silicon thin-film transistors on a glass substrate

    NASA Astrophysics Data System (ADS)

    Ohsawa, Hiroki; Sasaki, Shun; Hara, Akito

    2016-03-01

    Self-aligned four-terminal n-channel (n-ch) and p-channel (p-ch) planar embedded metal double-gate polycrystalline-silicon (poly-Si) thin-film transistors (TFTs) were fabricated on a glass substrate at a low temperature of 550 °C. This device includes a metal top gate (TG) and a metal bottom gate (BG), which are used as the drive and control gates or vice versa. The BG was embedded in a glass substrate, and a poly-Si channel with large lateral grains was fabricated by continuous-wave laser lateral crystallization. The threshold voltage modulation factors under various control gate voltages (γ = ΔVth/ΔVCG) were nearly equal to the theoretical predictions in both the n- and p-ch TFTs. By exploiting this high controllability, an enhancement depletion (ED) inverter was fabricated, and successful operation at 2.0 V was confirmed.

  6. Charge retention characteristics of silicide-induced crystallized polycrystalline silicon floating gate thin-film transistors for active matrix organic light-emitting diode.

    PubMed

    Park, Jae Hyo; Son, Se Wan; Byun, Chang Woo; Kim, Hyung Yoon; Joo, So Na; Lee, Yong Woo; Yun, Seung Jae; Joo, Seung Ki

    2013-10-01

    In this work, non-volatile memory thin-film transistor (NVM-TFT) was fabricated by nickel silicide-induced laterally crystallized (SILC) polycrystalline silicon (poly-Si) as the active layer. The nickel seed silicide-induced crystallized (SIC) poly-Si was used as storage layer which is embedded in the gate insulator. The novel unit pixel of active matrix organic light-emitting diode (AMOLED) using NVM-TFT is proposed and investigated the electrical and optical performance. The threshold voltage shift showed 17.2 V and the high reliability of retention characteristic was demonstrated until 10 years. The retention time can modulate the recharge refresh time of the unit pixel of AMOLED up to 5000 sec.

  7. Thin film transistors with wurtzite ZnO channels grown on Si3N4/SiO2/Si (111) substrates by pulsed laser deposition

    NASA Astrophysics Data System (ADS)

    Rogers, D. J.; Sandana, V. E.; Teherani, F. Hosseini; Razeghi, M.

    2010-03-01

    Thin Film Transistors (TFT) were made by growing ZnO on Si3N4/SiO2/Si (111) substrates by pulsed laser deposition. X-ray diffraction and scanning electron microscope studies revealed the ZnO to have a polycrystalline wurtzite structure with a smooth surface, good crystallographic quality and a strong preferential c-axis orientation. Transmission studies in similar ZnO layers on glass substrates showed high transmission over the whole visible spectrum. Electrical measurements of a back gate geometry FET showed an enhancement-mode response with hard saturation, mA range Id and a VON ~ 0V. When scaled down, such TFTs may be of interest for high frequency applications.

  8. Designing novel thin film polycrystalline solar cells for high efficiency: sandwich CIGS and heterojunction perovskite

    NASA Astrophysics Data System (ADS)

    Wang, Tianyue; Chen, Jiewei; Wu, Gaoxiang; Song, Dandan; Li, Meicheng

    2017-01-01

    Heterojunction and sandwich architectures are two new-type structures with great potential for solar cells. Specifically, the heterojunction structure possesses the advantages of efficient charge separation but suffers from band offset and large interface recombination; the sandwich configuration is favorable for transferring carriers but requires complex fabrication process. Here, we have designed two thin-film polycrystalline solar cells with novel structures: sandwich CIGS and heterojunction perovskite, referring to the advantages of the architectures of sandwich perovskite (standard) and heterojunction CIGS (standard) solar cells, respectively. A reliable simulation software wxAMPS is used to investigate their inherent characteristics with variation of the thickness and doping density of absorber layer. The results reveal that sandwich CIGS solar cell is able to exhibit an optimized efficiency of 20.7%, which is much higher than the standard heterojunction CIGS structure (18.48%). The heterojunction perovskite solar cell can be more efficient employing thick and doped perovskite films (16.9%) than these typically utilizing thin and weak-doping/intrinsic perovskite films (9.6%). This concept of structure modulation proves to be useful and can be applicable for other solar cells. Project supported by the National High-Tech R&D Program of China (No. 2015AA034601), the National Natural Science Foundation of China (Nos. 91333122, 61204064, 51202067, 51372082, 51402106, 11504107), the Ph.D. Programs Foundation of Ministry of Education of China (Nos. 20120036120006, 20130036110012), the Par-Eu Scholars Program, and the Fundamental Research Funds for the Central Universities.

  9. Chemical speciation at buried interfaces in high-temperature processed polycrystalline silicon thin-film solar cells on ZnO:Al

    NASA Astrophysics Data System (ADS)

    Becker, Christiane; Pagels, Marcel; Zachäus, Carolin; Pollakowski, Beatrix; Beckhoff, Burkhard; Kanngießer, Birgit; Rech, Bernd

    2013-01-01

    The combination of polycrystalline silicon (poly-Si) thin films with aluminum doped zinc oxide layers (ZnO:Al) as transparent conductive oxide enables the design of appealing optoelectronic devices at low costs, namely in the field of photovoltaics. The fabrication of both thin-film materials requires high-temperature treatments, which are highly desired for obtaining a high electrical material quality. Annealing procedures are typically applied during crystallization and defect-healing processes for silicon and can boost the carrier mobility and conductivity of ZnO:Al layers. In a combined poly-Si/ZnO:Al layer system, an in-depth knowledge of the interaction of both layers and the control of interface reactions upon thermal treatments is crucial. Therefore, we analyze the influence of rapid thermal treatments up to 1050 °C on solid phase crystallized poly-Si thin-film solar cells on ZnO:Al-coated glass, focusing on chemical interface reactions and modifications of the poly-Si absorber material quality. The presence of a ZnO:Al layer in the solar cell stack was found to limit the poly-Si solar cell performance with open circuit voltages only below 390 mV (compared to 435 mV without ZnO film), even if a silicon nitride (SiN) diffusion barrier was included. A considerable amount of diffused zinc inside the silicon was observed. By grazing-incidence X-ray fluorescence spectrometry, a depth-resolving analysis of the elemental composition close to the poly-Si/(SiN)/ZnO:Al interface was carried out. Temperatures above 1000 °C were found to promote the formation of new chemical compounds within about 10 nm of interface, such as zinc silicates (Zn2SiO4) and aluminium oxide (AlxOy). These results give valuable insights about the temperature-limitations of Si/ZnO thin-film solar cell fabrication and the formation of high-mobility ZnO-layers by thermal anneal.

  10. Strain evolution of each type of grains in poly-crystalline (Ba,Sr)TiO3 thin films grown by sputtering

    PubMed Central

    Park, Woo Young; Park, Min Hyuk; Lee, Jong Ho; Yoon, Jung Ho; Han, Jeong Hwan; Choi, Jung-Hae; Hwang, Cheol Seong

    2012-01-01

    The strain states of [111]-, [110]-, and [002]-oriented grains in poly-crystalline sputtered (Ba,Sr)TiO3 thin films on highly [111]-oriented Pt electrode/Si substrates were carefully examined by X-ray diffraction techniques. Remarkably, [002]-oriented grains respond more while [110]- and [111]-oriented grains do less than the theoretically estimated responses, which is understandable from the arrangement of the TiO6 octahedra with respect to the stress direction. Furthermore, such mechanical responses are completely independent of the degree of crystallization and film thickness. The transition growth temperature between the positive and negative strains was also different depending on the grain orientation. The unstrained lattice parameter for each type of grain was different suggesting that the oxygen vacancy concentration for each type of grain is different, too. The results reveal that polycrystalline (Ba,Sr)TiO3 thin films are not an aggregation of differently oriented grains which simply follow the mechanical behavior of single crystal with different orientations. PMID:23230505

  11. Metal Induced Growth of Si Thin Films and NiSi Nanowires

    DTIC Science & Technology

    2010-02-25

    Zinc Oxide Over MIG Silicon- We have been studying the formation of ZnO films by RF sputtering. Part of this study deals with...about 50 nm. 15. SUBJECT TERMS Thin film silicon, solar cells, thin film transistors , nanowires, metal induced growth 16. SECURITY CLASSIFICATION...to achieve, µc-Si is more desirable than a-Si due to its increased mobility. Thin film µc-Si is also a popular material for thin film transistors

  12. Ultrafast carrier dynamics and the role of grain boundaries in polycrystalline silicon thin films grown by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Titova, Lyubov V.; Cocker, Tyler L.; Xu, Sijia; Baribeau, Jean-Marc; Wu, Xiaohua; Lockwood, David J.; Hegmann, Frank A.

    2016-10-01

    We have used time-resolved terahertz spectroscopy to study microscopic photoconductivity and ultrafast photoexcited carrier dynamics in thin, pure, non-hydrogenated silicon films grown by molecular beam epitaxy on quartz substrates at temperatures ranging from 335 °C to 572 °C. By controlling the growth temperature, thin silicon films ranging from completely amorphous to polycrystalline with minimal amorphous phase can be achieved. Film morphology, in turn, determines its photoconductive properties: in the amorphous phase, carriers are trapped in bandtail states on sub-picosecond time scales, while the carriers excited in crystalline grains remain free for tens of picoseconds. We also find that in polycrystalline silicon the photoexcited carrier mobility is carrier-density-dependent, with higher carrier densities mitigating the effects of grain boundaries on inter-grain transport. In a film grown at the highest temperature of 572 °C, the morphology changes along the growth direction from polycrystalline with needles of single crystals in the bulk of the film to small crystallites interspersed with amorphous silicon at the top of the film. Depth profiling using different excitation wavelengths shows corresponding differences in the photoconductivity: the photoexcited carrier lifetime and mobility are higher in the first 100-150 nm from the substrate, suggesting that thinner, low-temperature grown polycrystalline silicon films are preferable for photovoltaic applications.

  13. Synthesis and characterization of polycrystalline semiconductor Caesium-Tin tri-Iodide thin-films

    NASA Astrophysics Data System (ADS)

    Chen, Zhuo

    This thesis deals with a virtually unexplored semiconductor material CsSnI3 from material synthesis, structural, optical, and electrical characterization to the fabrication and validation of CsSnI3 thin-film solar cells. We started with synthesizing CsSnI3 thin films based on CsI and SnCl2 (or SnI2) by using an apparatus which consists of e-beam and thermal evaporators. The quality of polycrystalline CsSnI3 thin-films were studied by scanning electron microscopy (SEM), transmission electron microscopy (TEM), and X-ray diffraction (XRD). Experimental data on XRD and electron diffraction patterns taking from the synthesized thin-films match very well to the theoretically calculated ones based the first principles calculations, confirming that the synthesized CsSnI3 thin-films have an orthorhombic crystal structure. With the well-defined crystal structure, we theoretically studied the electronic band structure of CsSnI3. Extensive optical characterizations of CsSnI3 thin-films were then carried out revealing many extraordinary properties such as 1) direct band gap energy of 1.32 eV at 300 K with its abnormal temperature dependence, 2) extremely high photoluminescence quantum yield, 3) large exciton binding energy, and 4) strong two-phonon assisted excitonic absorption near band edge. These properties are interpreted in terms of the unique electronic and structural properties of CsSnI3. The value of 1.3 eV for the energy band gap of CsSnI3 suggests a unique application of CsSnI3 thin-films on solar cells. This is because this value is right in the small range of the optimal band gaps for the Shockley-Queisser maximum efficiency limit of a single-junction solar cell. A prototype Schottky solar cell was designed, fabricated, and validated. The measured power conversion efficiency (PCE) is 0.9 % which is presently limited by the series and shunt resistance. The improvement strategy on PCE is given at the end of my thesis. In order to make the CsSnI3 thin-film solar cells

  14. Recovery Act : Near-Single-Crystalline Photovoltaic Thin Films on Polycrystalline, Flexible Substrates

    SciTech Connect

    Venkat Selvamanickam; Alex Freundlich

    2010-11-29

    III-V photovoltaics have exhibited efficiencies above 40%, but have found only a limited use because of the high cost of single crystal substrates. At the other end of the spectrum, polycrystalline and amorphous thin film solar cells offer the advantage of low-cost fabrication, but have not yielded high efficiencies. Our program is based on single-crystalline-like thin film photovoltaics on polycrystalline substrates using biaxially-textured templates made by Ion Beam-Assisted Deposition (IBAD). MgO templates made by IBAD on flexible metal substrate have been successfully used for epitaxial growth of germanium films. In spite of a 4.5% lattice mismatch, heteroepitaxial growth of Ge was achieved on CeO2 that was grown on IBAD MgO template. Room temperature optical bandgap of the Ge films was identified at 0.67 eV indicating minimal residual strain. Refraction index and extinction coefficient values of the Ge films were found to match well with that measured from a reference Ge single crystal. GaAs has been successfully grown epitaxially on Ge on metal substrate by molecular beam epitaxy. RHEED patterns indicate self annihilation of antiphase boundaries and the growth of a single domain GaAs. The GaAs is found to exhibit strong photoluminescence signal and, an existence of a relatively narrow (FWHM~20 meV) band-edge excitons measured in this film indicates a good optoelectronic quality of deposited GaAs. While excellent epitaxial growth has been achieved in GaAs on flexible metal substrates, the defect density of the films as measured by High Resolution X-ray Diffraction and etch pit experiments showed a high value of 5 * 10^8 per cm^2. Cross sectional transmission electron microscopy of the multilayer architecture showed concentration of threading dislocations near the germanium-ceria interface. The defect density was found decrease as the Ge films were made thicker. The defects appear to originate from the MgO layer presumably because of large lattice mismatches

  15. Thickness dependence of structure and piezoelectric properties at nanoscale of polycrystalline lead zirconate titanate thin films

    NASA Astrophysics Data System (ADS)

    Araújo, E. B.; Lima, E. C.; Bdikin, I. K.; Kholkin, A. L.

    2013-05-01

    Lead zirconate titanate Pb(Zr0.50Ti0.50)O3 (PZT) thin films were deposited by a polymeric chemical method on Pt(111)/Ti/SiO2/Si substrates to understand the mechanisms of phase transformations and the effect of film thickness on the structure, dielectric, and piezoelectric properties in these films. PZT films pyrolyzed at temperatures higher than 350 °C present a coexistence of pyrochlore and perovskite phases, while only perovskite phase grows in films pyrolyzed at temperatures lower than 300 °C. For pyrochlore-free PZT thin films, a small (100)-orientation tendency near the film-substrate interface was observed. Finally, we demonstrate the existence of a self-polarization effect in the studied PZT thin films. The increase of self-polarization with the film thickness increasing from 200 nm to 710 nm suggests that Schottky barriers and/or mechanical coupling near the film-substrate interface are not primarily responsible for the observed self-polarization effect in our films.

  16. Local impedance imaging of boron-doped polycrystalline diamond thin films

    SciTech Connect

    Zieliński, A.; Ryl, J.; Burczyk, L.; Darowicki, K.

    2014-09-29

    Local impedance imaging (LII) was used to visualise surficial deviations of AC impedances in polycrystalline boron-doped diamond (BDD). The BDD thin film electrodes were deposited onto the highly doped silicon substrates via microwave plasma-enhanced CVD. The studied boron dopant concentrations, controlled by the [B]/[C] ratio in plasma, ranged from 1 × 10{sup 16} to 2 × 10{sup 21} atoms cm{sup −3}. The BDD films displayed microcrystalline structure, while the average size of crystallites decreased from 1 to 0.7 μm with increasing [B]/[C] ratios. The application of LII enabled a direct and high-resolution investigation of local distribution of impedance characteristics within the individual grains of BDD. Such an approach resulted in greater understanding of the microstructural control of properties at the grain level. We propose that the obtained surficial variation of impedance is correlated to the areas of high conductance which have been observed at the grain boundaries by using LII. We also postulate that the origin of high conductivity is due to either preferential boron accumulation, the presence of defects, or sp{sup 2} regions in the intragrain regions. The impedance modulus recorded by LII was in full agreement with the bulk impedance measurements. Both variables showed a decreasing trend with increasing [B]/[C] ratios, which is consistent with higher boron incorporation into BDD film.

  17. Reactive sputtering of YBaCuO thin films on polycrystalline zirconia substrates: optimization results

    NASA Astrophysics Data System (ADS)

    Degardin, A.; Bodin, C.; Dolin, C.; Kreisler, A.

    1998-01-01

    In situ elaboration of YBaCuO thin films, on polycrystalline yttria doped zirconia substrates, has been optimized. A reactive sputtering model has been developed and the electrical conductivity of the substrate has been studied as a function of temperature and doping. The J_c value of ≈ 3× 10^4~A/cm^2 at 77 K, measured on microbridges, is among the best reported in the literature for this substrate type. L'élaboration in situ de films minces d'YBaCuO, sur substrats de zircone polycristalline dopée à l'oxyde d'yttrium, a été optimisée en développant un modèle de pulvérisation réactive et en étudiant la conductivité électrique du substrat en fonction du dopage et de la température. La valeur de J_c ≈ 3× 10^4 ~A/cm^2 à 77 K, mesurée sur microponts, se situe parmi les meilleures citées dans la littérature pour ce type de substrat.

  18. Local electrical conduction in polycrystalline La-doped BiFeO₃ thin films.

    PubMed

    Zhou, Ming-Xiu; Chen, Bo; Sun, Hai-Bin; Wan, Jian-Guo; Li, Zi-Wei; Liu, Jun-Ming; Song, Feng-Qi; Wang, Guang-Hou

    2013-06-07

    Local electrical conduction behaviors of polycrystalline La-doped BiFeO3 thin films have been investigated by combining conductive atomic force microscopy and piezoelectric force microscopy. Nanoscale current measurements were performed as a function of bias voltage for different crystal grains. Completely distinct conducting processes and resistive switching effects were observed in the grain boundary and grain interior. We have revealed that local electric conduction in a grain is dominated by both the grain boundary and ferroelectric domain, and is closely related to the applied electric field and the as-grown state of the grain. At lower voltages the electrical conduction is dominated by the grain boundary and is associated with the redistribution of oxygen vacancies in the grain boundary under external electric fields. At higher voltages both the grain boundary and ferroelectric domain are responsible for the electrical conduction of grains, and the electrical conduction gradually extends from the grain boundary into the grain interior due to the extension of the ferroelectric domain towards the grain interior. We have also demonstrated that the conduction dominated by the grain boundary exhibits a much small switching voltage, while the conduction of the ferroelectric domain causes a much high switching voltage in the grain interior.

  19. Scaling behavior of moisture-induced grain degradation in polycrystalline hybrid perovskite thin films

    DOE PAGES

    Wang, Qi; Chen, Bo; Liu, Ye; ...

    2017-01-01

    The stability of perovskite solar cells has shown a huge variation with respect to the film process and film morphology, while the underlining mechanism for the morphology-dependent degradation of the perovskite film has remained elusive. Herein, we report a scaling behavior of moisture-induced grain degradation in polycrystalline CH3NH3PbI3 films. The degradation rates of CH3NH3PbI3 films in moisture were shown to be sensitive to the grain sizes. The duration that was needed for different films to degrade by the same percent showed a linear relationship with the grain size, despite the fact that the films were formed by five different depositionmore » methods. This scaling behavior can be explained by the degradation along the in-plane direction, which is initiated at the grain boundary (GB). The GBs of CH3NH3PbI3 films consist of an amorphous intergranular layer, which allows quick diffusion of moisture into the perovskite films. It was found that thermal annealing induced surface self-passivation plays a critical role in stabilizing the surfaces of thin films and single crystals by reducing the moisture-sensitive methylammonium ions at the surface. Finally, the determination of the scaling behavior of grain degradation highlights the importance of stabilizing the GBs to improve the stability of perovskite solar cells.« less

  20. Scaling behavior of moisture-induced grain degradation in polycrystalline hybrid perovskite thin films

    SciTech Connect

    Wang, Qi; Chen, Bo; Liu, Ye; Deng, Yehao; Bai, Yang; Dong, Qingfeng; Huang, Jinsong

    2017-01-01

    The stability of perovskite solar cells has shown a huge variation with respect to the film process and film morphology, while the underlining mechanism for the morphology-dependent degradation of the perovskite film has remained elusive. Herein, we report a scaling behavior of moisture-induced grain degradation in polycrystalline CH3NH3PbI3 films. The degradation rates of CH3NH3PbI3 films in moisture were shown to be sensitive to the grain sizes. The duration that was needed for different films to degrade by the same percent showed a linear relationship with the grain size, despite the fact that the films were formed by five different deposition methods. This scaling behavior can be explained by the degradation along the in-plane direction, which is initiated at the grain boundary (GB). The GBs of CH3NH3PbI3 films consist of an amorphous intergranular layer, which allows quick diffusion of moisture into the perovskite films. It was found that thermal annealing induced surface self-passivation plays a critical role in stabilizing the surfaces of thin films and single crystals by reducing the moisture-sensitive methylammonium ions at the surface. Finally, the determination of the scaling behavior of grain degradation highlights the importance of stabilizing the GBs to improve the stability of perovskite solar cells.

  1. Polycrystalline silicon thin-film solar cells with plasmonic-enhanced light-trapping.

    PubMed

    Varlamov, Sergey; Rao, Jing; Soderstrom, Thomas

    2012-07-02

    One of major approaches to cheaper solar cells is reducing the amount of semiconductor material used for their fabrication and making cells thinner. To compensate for lower light absorption such physically thin devices have to incorporate light-trapping which increases their optical thickness. Light scattering by textured surfaces is a common technique but it cannot be universally applied to all solar cell technologies. Some cells, for example those made of evaporated silicon, are planar as produced and they require an alternative light-trapping means suitable for planar devices. Metal nanoparticles formed on planar silicon cell surface and capable of light scattering due to surface plasmon resonance is an effective approach. The paper presents a fabrication procedure of evaporated polycrystalline silicon solar cells with plasmonic light-trapping and demonstrates how the cell quantum efficiency improves due to presence of metal nanoparticles. To fabricate the cells a film consisting of alternative boron and phosphorous doped silicon layers is deposited on glass substrate by electron beam evaporation. An Initially amorphous film is crystallised and electronic defects are mitigated by annealing and hydrogen passivation. Metal grid contacts are applied to the layers of opposite polarity to extract electricity generated by the cell. Typically, such a ~2 μm thick cell has a short-circuit current density (Jsc) of 14-16 mA/cm(2), which can be increased up to 17-18 mA/cm(2) (~25% higher) after application of a simple diffuse back reflector made of a white paint. To implement plasmonic light-trapping a silver nanoparticle array is formed on the metallised cell silicon surface. A precursor silver film is deposited on the cell by thermal evaporation and annealed at 23°C to form silver nanoparticles. Nanoparticle size and coverage, which affect plasmonic light-scattering, can be tuned for enhanced cell performance by varying the precursor film thickness and its annealing

  2. Interconnected Si nanocrystals forming thin films with controlled bandgap values

    SciTech Connect

    Nychyporuk, T.; Zakharko, Yu.; Lysenko, V.; Lemiti, M.

    2009-08-24

    Interconnected Si nanocrystals forming homogeneous thin films with controlled bandgap values from 1.2 to 2.9 eV were formed by pulsed plasma enhanced chemical vapor deposition technique under dusty plasma conditions. The chosen values of plasma duration time correspond to specific phases of the dust nanoparticle growth. Structural and optical properties of the deposited nanostructured films are described in details. These nanocrystalline Si thin films seem to be promising candidates for all-Si tandem solar cell applications.

  3. High Energy Effects on Thermoelectric and Optical Properties of Si/Si+Sb Nanolayered Thin Films

    DTIC Science & Technology

    2013-04-01

    REPORT High Energy Effects on Thermoelectric and Optical Properties of Si/Si+Sb Nanolayered Thin Films 14. ABSTRACT 16. SECURITY CLASSIFICATION OF: We...Energy Effects on Thermoelectric and Optical Properties of Si/Si+Sb Nanolayered Thin Films Report Title ABSTRACT We have prepared thermoelectric...the cross plane Seebeck coefficient and increase the cross plane electrical conductivity to increase the figure of merit. Some optical

  4. Height-resolved quantification of microstructure and texture in polycrystalline thin films using TEM orientation mapping.

    PubMed

    Aebersold, A Brian; Alexander, Duncan T L; Hébert, Cécile

    2015-12-01

    A method is presented for the quantitative investigation of microstructure and texture evolution in polycrystalline thin films based on in-plane automated crystal orientation mapping in transmission electron microscopy, from the substrate up. To demonstrate the method we apply it to the example of low pressure metal-organic chemical vapor deposited ZnO layers. First, orientation mapping is applied to standard cross-section and plan-view transmission electron microscopy samples of films, illustrating how plan-view samples both reduce the occurrence of grain overlap that is detrimental to reliable orientation mapping and also improve sampling statistics compared to cross-sections. Motivated by this, orientation mapping has been combined with a double-wedge method for specimen preparation developed by Spiecker et al. (2007) [1], which creates a large area plan-view sample that traverses the film thickness. By measuring >10,000 grains in the film, the resulting data give access to grain size, orientation and misorientation distributions in function of height above the substrate within the film, which are, in turn, the inputs necessary for quantitative assessment of growth models and simulations. The orientation data are directly related to microstructural images, allowing correlation of orientations with in-plane and out-of-plane grain sizes and shapes. The spatial correlation of the entire data set gives insights into previously unnoticed growth mechanisms such as the presence of renucleation or preferred misorientations. Finally, the data set can be used to guide targeted, local studies by other transmission electron microscopy techniques. This is demonstrated by the site-specific application of nano-beam diffraction to validate the presence of coherent [21̄1̄0]/(011̄3) twin boundaries first suggested by the orientation mapping.

  5. The Seebeck coefficient of monocrystalline α-SiC and polycrystalline β-SiC measured at 300-533 K

    NASA Astrophysics Data System (ADS)

    Abu-Ageel, N.; Aslam, M.; Ager, R.; Rimai, L.

    2000-01-01

    The temperature dependence of the Seebeck coefficient of polycrystalline icons/Journals/Common/beta" ALT="beta" ALIGN="TOP"/> -SiC films deposited on quartz substrates by laser ablation and of commercially available icons/Journals/Common/alpha" ALT="alpha" ALIGN="TOP"/> -SiC wafers is reported in a temperature range of 300-533 K for the first time. The Seebeck emf of icons/Journals/Common/alpha" ALT="alpha" ALIGN="TOP"/> -SiC substrates and icons/Journals/Common/beta" ALT="beta" ALIGN="TOP"/> -SiC samples ranges between -9 µV °C-1 and -108 µV °C-1 which is higher than that of commercial Pt thermocouples.

  6. Influence of thickness on physical properties of vacuum evaporated polycrystalline CdTe thin films for solar cell applications

    NASA Astrophysics Data System (ADS)

    Chander, Subhash; Dhaka, M. S.

    2016-02-01

    This paper presents the influence of thickness on physical properties of polycrystalline CdTe thin films. The thin films of thickness 450 nm, 650 nm and 850 nm were deposited employing thermal vacuum evaporation technique on glass and indium tin oxide (ITO) coated glass substrates. The physical properties of these as-grown thin films were investigated employing the X-ray diffraction (XRD), source meter, UV-Vis spectrophotometer, scanning electron microscopy (SEM) coupled with energy dispersive spectroscopy (EDS). The structural analysis reveals that the films have zinc-blende cubic structure and polycrystalline in nature with preferred orientation (111). The structural parameters like lattice constant, interplanar spacing, grain size, strain, dislocation density and number of crystallites per unit area are calculated. The average grain size and optical band gap are found in the range 15.16-21.22 nm and 1.44-1.63 eV respectively and observed to decrease with thickness. The current-voltage characteristics show that the electrical conductivity is observed to decrease with thickness. The surface morphology shows that films are free from crystal defects like pin holes and voids as well as homogeneous and uniform. The EDS patterns show the presence of cadmium and tellurium elements in the as grown films. The experimental results reveal that the film thickness plays significant role on the physical properties of as-grown CdTe thin films and higher thickness may be used as absorber layer to solar cells applications.

  7. Synthesis of (SiC){sub 3}N{sub 4} thin films by ion implantation

    SciTech Connect

    Uslu, C.; Lee, D.H.; Berta, Y.; Park, B.; Thadhani, N.N.; Poker, D.B.

    1993-12-31

    We have investigated the synthesis of carbon-silicon-nitride compounds by ion implantation. In these experiments, 100 keV nitrogen ions were implanted into polycrystalline {beta}-SiC (cubic phase) at various substrate temperatures and ion doses. These thin films were characterized by x-ray diffraction with a position-sensitive detector, transmission electron microscopy with chemical analysis, and Rutherford backscattering spectroscopy. The as-implanted samples show a buried amorphous layer at a depth of 170 nm. Peak concentration of nitrogen saturates at approximately 45 at. % with doses above {approximately} 9.0 {times} 10{sup 17} N/cm{sup 2} at 860{degree}C. These results suggest formation of a new phase by nitrogen implantation into {beta}-SiC.

  8. Mechanical properties of free-standing polycrystalline metallic thin films and multilayers

    NASA Astrophysics Data System (ADS)

    Huang, Haibo

    1998-11-01

    A laser-diffraction tensile tester and a balance-beam creep apparatus were improved and applied to the study of free standing polycrystalline thin films with a strong $ texture. Studied are electron beam deposited Ag, Cu, Al films, and Ag/Cu multilayers consisting of alternating Ag and Cu layers with 1:1 thickness ratio. All films have a total thickness around 3 mum. In tensile testing, a thin polymeric two-dimensional diffraction grid was deposited on the film surface by microlithographic techniques. Local strains were measured from the relative displacements of two diffracted laser spots. This allows determination of Young's modulus, Poisson's ratio and, since large strains can be measured, the yield stress, ultimate tensile strength and fracture strain. The average values of the Young moduli and Poisson ratios, determined from hundreds of measurements, are 63 GPa and 0.42 for Ag, 102 GPa and 0.37 for Cu, 57 GPa and 0.41 for Al, and 87.5 GPa and 0.38 for Ag/Cu multilayers. In all cases, the Young moduli are about 20% lower than the values calculated from the literature data and are independent of the bilayer repeat length, λ , in the Ag/Cu multilayers. No "supermodulus" effect was observed at small values of λ . An anelastic model was proposed to explain the low Young moduli, the hysteresis loops on the stress-strain curves, and a 4.3 pm 0.2 GPa/decade strain rate dependence of the Young modulus in Al. The ductility of the Ag/Cu multilayers decreases when λ is reduced. For λ 80 nm, the yield stress increases linearly with λsp{{-}alpha} where alpha = 0.244. The results are compared to the predictions of Hall-Petch-type models. In creep testing, steady-state creep rates were measured on Cu films as a function of stress and temperature. In the high temperature-low stress region (100-650spcircC, 5-90 MPa), the creep rate is described by dot\\varepsilon =A{\\cdot}sigmasp{n} exp\\{{-}Q/kT\\}. A core-diffusion controlled dislocation climb model was proposed to

  9. Exploration of maximum count rate capabilities for large-area photon counting arrays based on polycrystalline silicon thin-film transistors

    NASA Astrophysics Data System (ADS)

    Liang, Albert K.; Koniczek, Martin; Antonuk, Larry E.; El-Mohri, Youcef; Zhao, Qihua

    2016-03-01

    Pixelated photon counting detectors with energy discrimination capabilities are of increasing clinical interest for x-ray imaging. Such detectors, presently in clinical use for mammography and under development for breast tomosynthesis and spectral CT, usually employ in-pixel circuits based on crystalline silicon - a semiconductor material that is generally not well-suited for economic manufacture of large-area devices. One interesting alternative semiconductor is polycrystalline silicon (poly-Si), a thin-film technology capable of creating very large-area, monolithic devices. Similar to crystalline silicon, poly-Si allows implementation of the type of fast, complex, in-pixel circuitry required for photon counting - operating at processing speeds that are not possible with amorphous silicon (the material currently used for large-area, active matrix, flat-panel imagers). The pixel circuits of two-dimensional photon counting arrays are generally comprised of four stages: amplifier, comparator, clock generator and counter. The analog front-end (in particular, the amplifier) strongly influences performance and is therefore of interest to study. In this paper, the relationship between incident and output count rate of the analog front-end is explored under diagnostic imaging conditions for a promising poly-Si based design. The input to the amplifier is modeled in the time domain assuming a realistic input x-ray spectrum. Simulations of circuits based on poly-Si thin-film transistors are used to determine the resulting output count rate as a function of input count rate, energy discrimination threshold and operating conditions.

  10. Epitaxially grown polycrystalline silicon thin-film solar cells on solid-phase crystallised seed layers

    NASA Astrophysics Data System (ADS)

    Li, Wei; Varlamov, Sergey; Xue, Chaowei

    2014-09-01

    This paper presents the fabrication of poly-Si thin film solar cells on glass substrates using seed layer approach. The solid-phase crystallised P-doped seed layer is not only used as the crystalline template for the epitaxial growth but also as the emitter for the solar cell structure. This paper investigates two important factors, surface cleaning and intragrain defects elimination for the seed layer, which can greatly influence the epitaxial grown solar cell performance. Shorter incubation and crystallisation time is observed using a simplified RCA cleaning than the other two wet chemical cleaning methods, indicating a cleaner seed layer surface is achieved. Cross sectional transmission microscope images confirm a crystallographic transferal of information from the simplified RCA cleaned seed layer into the epi-layer. RTA for the SPC seed layer can effectively eliminate the intragrain defects in the seed layer and improve structural quality of both of the seed layer and the epi-layer. Consequently, epitaxial grown poly-Si solar cell on the RTA treated seed layer shows better solar cell efficiency, Voc and Jsc than the one on the seed layer without RTA treatment.

  11. High-efficiency heterojunction crystalline Si solar cell and optical splitting structure fabricated by applying thin-film Si technology

    NASA Astrophysics Data System (ADS)

    Yamamoto, Kenji; Adachi, Daisuke; Uzu, Hisashi; Ichikawa, Mitsuru; Terashita, Toru; Meguro, Tomomi; Nakanishi, Naoaki; Yoshimi, Masashi; Hernández, José Luis

    2015-08-01

    Thin-film Si technology for solar cells has been developed for over 40 years. Improvements in the conversion efficiency and industrialization of thin-film Si solar cells have been realized through continuous research and development of the thin-film Si technology. The thin-film Si technology covers a wide range of fields such as fundamental understanding of the nature of thin-film Si, cell/module production, simulation, and reliability technologies. These technologies are also significant for solar cells other than the thin-film Si solar cells. Utilizing the highly developed thin-film Si solar cell technology, we have achieved ∼24% efficiency heterojunction crystalline Si solar cells using 6-in. wafers and >26% efficiency solar cells with an optical splitting structure. These results indicate that further improvement of thin-film Si technology and its synergy with crystalline Si solar cell technology will enable further improvement of solar cells with efficiencies above 26%.

  12. Impact of annealing on physical properties of e-beam evaporated polycrystalline CdO thin films for optoelectronic applications

    NASA Astrophysics Data System (ADS)

    Purohit, Anuradha; Chander, S.; Dhaka, M. S.

    2017-04-01

    An impact of annealing on the physical properties of polycrystalline CdO thin films is carried out in this study. CdO thin films of thickness 650 nm were fabricated on glass and indium tin oxide (ITO) substrates employing e-beam evaporation technique. The pristine thin films were annealed in air atmosphere at 250 °C, 400 °C and 550 °C for one hour followed by investigation of structural, optical, electrical and morphological properties along with elemental composition using X-ray diffraction (XRD), UV-Vis spectrophotometer, Fourier transform infrared (FTIR) spectrometer, source meter, scanning electron microscopy (SEM) and energy-dispersive spectroscopy (EDS), respectively. XRD patterns confirmed the polycrystalline nature and cubic structure (with space group Fm 3 bar m) of the films. The crystallographic parameters are calculated and found to be influenced by the post-air annealing treatment. The optical study shows that direct band gap is ranging from 1.98 eV to 2.18 eV and found to be decreased with post-annealing. The refractive index and optical conductivity are also increased with annealing temperature. The current-voltage characteristics show ohmic behaviour of the annealed films. The surface morphology is observed to be improved with annealing and grain-size is increased as well as EDS spectrum confirmed the presence of cadmium (Cd) and oxygen (O) in the deposited films.

  13. Polycrystalline thin film materials and devices. Annual subcontract report, 16 January 1990--15 January 1991

    SciTech Connect

    Baron, B.N.; Birkmire, R.W.; Phillips, J.E.; Shafarman, W.N.; Hegedus, S.S.; McCandless, B.E.

    1991-11-01

    Results and conclusion of Phase I of a multi-year research program on polycrystalline thin film solar cells are presented. The research comprised investigation of the relationships among processing, materials properties and device performance of both CuInSe{sub 2} and CdTe solar cells. The kinetics of the formation of CuInSe{sub 2} by selenization with hydrogen selenide was investigated and a CuInSe{sub 2}/CdS solar cell was fabricated. An alternative process involving the reaction of deposited copper-indium-selenium layers was used to obtain single phase CuInSe{sub 2} films and a cell efficiency of 7%. Detailed investigations of the open circuit voltage of CuInSe{sub 2} solar cells showed that a simple Shockley-Read-Hall recombination mechanism can not account for the limitations in open circuit voltage. Examination of the influence of CuInSe{sub 2} thickness on cell performance indicated that the back contact behavior has a significant effect when the CuInSe{sub 2} is less than 1 micron thick. CdTe/CdS solar cells with efficiencies approaching 10% can be repeatedly fabricated using physical vapor deposition and serial post deposition processing. The absence of moisture during post deposition was found to be critical. Improvements in short circuit current of CdTe solar cells to levels approaching 25 mA/cm{sup 2} are achievable by making the CdS window layer thinner. Further reductions in the CdS window layer thickness are presently limited by interdiffusion between the CdS and the CdTe. CdTe/CdS cells stored without protection from the atmosphere were found to degrade. The degradation was attributed to the metal contact. CdTe cells with ZnTe:Cu contacts to the CdTe were found to be more stable than cells with metal contacts. Analysis of current-voltage and spectral response of CdTe/CdS cells indicates the cell operates as a p-n heterojunction with the diode current dominated by SRH recombination in the junction region of the CdTe.

  14. Transition between Efros–Shklovskii and Mott variable-range hopping conduction in polycrystalline germanium thin films

    NASA Astrophysics Data System (ADS)

    Li, Zhaoguo; Peng, Liping; Zhang, Jicheng; Li, Jia; Zeng, Yong; Luo, Yuechuan; Zhan, Zhiqiang; Meng, Lingbiao; Zhou, Minjie; Wu, Weidong

    2017-03-01

    We report on the electrical transport properties of polycrystalline germanium thin films which are grown by the DC magnetron sputtering method. The temperature dependent resistance of seven devices are measured from 290 K down to 10 K. The thermal excitation model dominating the transport properties at the high temperature regime (above ∼60 K) is demonstrated and the low temperature electron transport is governed by the variable-range hopping (VRH) mechanism. Moreover, we observed a transition from Efros–Shklovskii to Mott VRH at ∼25 K over the entire VRH conduction regime, which is well described by a universal scaling law.

  15. Selective Growth of Nanocrystalline 3C-SiC Thin Films on Si

    NASA Astrophysics Data System (ADS)

    Beke, D.; Pongrácz, A.; Battistig, G.; Josepovits, K.; Pécz, B.

    2010-11-01

    Epitaxial formation of SiC nanocrystals has been investigated on single crystal silicon surfaces. A simple and cheap method using reactive annealing in CO has been developed and patented by our group (BME AFT and MTA MFA). By this technique epitaxial 3C-SiC nanocrystals can be grown at the Si side of a SiO2/Si interface without void formation at the SiC/Si interface. CO diffusion and SiC nanocrystal formation on different silicon based systems (SiO2/Si, Si3N4/3Si and SiO2/LPCVD poly-Si) after CO treatment at 105 Pa at elevated temperatures (T>1000° C) will be presented. By optimizing the annealing time a thin continuous nanocrystalline SiC layer has been formed. Applying a patterned Si3N4 capping layer as a barrier layer against CO diffusion, SiC nanocrystal formation at the Si3N4/Si interface is inhibited. We will present the selective growth of SiC nanocrystals using the before mentioned technique.

  16. PbFe 12O 19 thin films prepared by pulsed laser deposition on Si/SiO 2 substrates

    NASA Astrophysics Data System (ADS)

    Díaz-Castañón, S.; Leccabue, F.; Watts, B. E.; Yapp, R.

    2000-10-01

    Pulsed laser ablation deposition has been used to grow polycrystalline PbFe 12O 19 thin films with high coercivity on Si/SiO 2 substrates. The influence of the substrate temperature (550-775°C) and the oxygen pressure (1.0-3.0 mbar) on the magnetic properties during the deposition is reported. The crystallisation of PbFe 12O 19 thin films occurs in the temperature range of 600-750°C, which is somewhat lower than that for the Sr and Ba hexaferrites, which crystallise in the range of 750-850°C. M-type lead hexaferrite films with high saturation magnetisation (280 emu/cm 3) and high coercive field (3.8 kOe) were grown using a substrate temperature of 700°C and a pressure of 3.0 mbar of oxygen. These films were observed to be isotropic, with an Mr/ Ms ratio of ˜0.5.

  17. Microstructure and ferroelectricity of BaTiO3 thin films on Si for integrated photonics

    NASA Astrophysics Data System (ADS)

    Kormondy, Kristy J.; Popoff, Youri; Sousa, Marilyne; Eltes, Felix; Caimi, Daniele; Rossell, Marta D.; Fiebig, Manfred; Hoffmann, Patrik; Marchiori, Chiara; Reinke, Michael; Trassin, Morgan; Demkov, Alexander A.; Fompeyrine, Jean; Abe, Stefan

    2017-02-01

    Significant progress has been made in integrating novel materials into silicon photonic structures in order to extend the functionality of photonic circuits. One of these promising optical materials is BaTiO3 or barium titanate (BTO) that exhibits a very large Pockels coefficient as required for high-speed light modulators. However, all previous demonstrations show a noticable reduction of the Pockels effect in BTO thin films deposited on silicon substrates compared to BTO bulk crystals. Here, we report on the strong dependence of the Pockels effect in BTO thin films on their microstructure, and provide guidelines on how to engineer thin films with strong electro-optic response. We employ several deposition methods such as molecular beam epitaxy and chemical vapor deposition to realize BTO thin films with different morphology and crystalline structure. While a linear electro-optic response is present even in porous, polycrystalline BTO thin films with an effective Pockels coefficient r eff = 6 pm V-1, it is maximized for dense, tetragonal, epitaxial BTO films (r eff = 140 pm V-1). By identifying the key structural predictors of electro-optic response in BTO/Si, we provide a roadmap to fully exploit the linear electro-optic effect in novel hybrid oxide/semiconductor nanophotonic devices.

  18. Microstructure and ferroelectricity of BaTiO3 thin films on Si for integrated photonics.

    PubMed

    Kormondy, Kristy J; Popoff, Youri; Sousa, Marilyne; Eltes, Felix; Caimi, Daniele; Rossell, Marta D; Fiebig, Manfred; Hoffmann, Patrik; Marchiori, Chiara; Reinke, Michael; Trassin, Morgan; Demkov, Alexander A; Fompeyrine, Jean; Abel, Stefan

    2017-02-17

    Significant progress has been made in integrating novel materials into silicon photonic structures in order to extend the functionality of photonic circuits. One of these promising optical materials is BaTiO3 or barium titanate (BTO) that exhibits a very large Pockels coefficient as required for high-speed light modulators. However, all previous demonstrations show a noticable reduction of the Pockels effect in BTO thin films deposited on silicon substrates compared to BTO bulk crystals. Here, we report on the strong dependence of the Pockels effect in BTO thin films on their microstructure, and provide guidelines on how to engineer thin films with strong electro-optic response. We employ several deposition methods such as molecular beam epitaxy and chemical vapor deposition to realize BTO thin films with different morphology and crystalline structure. While a linear electro-optic response is present even in porous, polycrystalline BTO thin films with an effective Pockels coefficient r eff = 6 pm V(-1), it is maximized for dense, tetragonal, epitaxial BTO films (r eff = 140 pm V(-1)). By identifying the key structural predictors of electro-optic response in BTO/Si, we provide a roadmap to fully exploit the linear electro-optic effect in novel hybrid oxide/semiconductor nanophotonic devices.

  19. Enhanced electrical properties at boundaries including twin boundaries of polycrystalline CdTe thin-film solar cells.

    PubMed

    Li, H; Liu, X X; Lin, Y S; Yang, B; Du, Z M

    2015-05-07

    The effect of grain boundaries (GBs), in particular twin boundaries (TBs), on CdTe polycrystalline thin films is studied by conductive atomic force microscopy (C-AFM), electron-beam-induced current (EBIC), scanning Kelvin probe microscopy (SKPM), electron backscatter diffraction (EBSD), and scanning transmission electron microscopy (STEM). Four types of CdTe grains with various densities of {111} Σ3 twin boundaries (TBs) are found in Cl-treated CdTe polycrystalline thin films: (1) grains having multiple {111} Σ3 TBs with a low angle to the film surface; (2) grains having multiple {111} Σ3 TBs parallel to the film surfaces; (3) small grains on a scale of not more than 500 nm, composed of Cd, Cl, Te, and O; and (4) CdTe grains with not more than two {111} Σ3 TBs. Grain boundaries (including TBs) exhibit enhanced current transport phenomena. However, the {111} Σ3 TB is much more beneficial to micro-current transport. The enhanced current transport can be explained by the lower electron potential at GBs (including TBs) than the grain interiors (GIs). Our results open new opportunities for enhancing solar cell performances by controlling the grain boundaries, and in particular TBs.

  20. Structure and magnetic properties of polycrystalline iron-platium and cobalt-platinum thin films for high density recording media

    NASA Astrophysics Data System (ADS)

    Jeong, Sangki

    2002-09-01

    The goal of this project was to investigate and increase the feasibility of use of FePt and CoPt polycrystalline thin films as high-density recording media, with a focus on targeting perpendicular recording. Understanding the atomic ordering process, developing the proper texture and small grains, lowering the processing temperature and optimizing magnetic properties were the main subjects of this thesis work. In this thesis, nano-structured polycrystalline high anisotropy thin films have been fabricated and characterized. Polycrystalline CoPt and FePt films exhibit perpendicular anisotropy after an annealing process only when their thickness is less than 5 nm. High temperature annealing is still required to obtain an atomically ordered phase with nearly full ordering. The ordering phase transformation is a discontinuous transformation that yields an inhomogeneous microstructure where significant amount of FCC phase remains, unless a long time annealing process is performed. To lower the atomic ordering temperature, an in-situ ordering process has been performed and the various underlayer structures with an MgO seed layer, have been deposited and investigated. Thin films with thicknesses below 10 nm exhibit perpendicular anisotropy with an average grain size in the range of 10--15 nm in this film. FePt [001] textured films using Pt/Ag seeding layer exhibit lower annealing temperature than FePt/MgO films, while other Ag or Cr seedlayers do not produce faster ordering kinetics. Based on the detailed analysis of nanostructure of FePt thin films, it has been learned that FCC disordered nanoclusters remains in the ordered grains. Detailed observation of magnetic properties and nanostructure by HRTEM suggests that, though a thermally activated component of the switching is observed, the low value of coercivity can be attributed predominantly to reversal processes associated with defect related domain nucleation. We postulate that the nucleation occurs in less ordered

  1. Ferroelectric properties of Bi2VO5.5 thin films on LaAlO3 and SiO2/Si substrates with LaNiO3 base electrode

    NASA Astrophysics Data System (ADS)

    Satyalakshmi, K. M.; Varma, K. B. R.; Hegde, M. S.

    1995-07-01

    Ferroelectric bismuth vanadate Bi2VO5.5 (BVO) thin films have been grown on LaAlO3 (LAO) and SiO2/Si substrates with LaNiO3 (LNO) base electrodes by the pulsed laser deposition technique. The effect of substrate temperature on the ferroelectric properties of BVO thin films, has been studied by depositing the thin films at different temperatures. The BVO thin films grown on LNO/LAO were textured whereas the thin films grown on LNO/SiO2/Si were polycrystalline. The BVO thin films grown at 450 °C exhibited good ferroelectric properties indicating that LNO acts as a good electrode material. The remanent polarization Pr and coercive field Ec obtained for the BVO thin films grown at 450 °C on LNO/LAO and LNO/SiO2/Si were 2.5 μC/cm2, 37 kV/cm and 4.6μC/cm2, 93 kV/cm, respectively.

  2. Impact of thermal annealing on physical properties of vacuum evaporated polycrystalline CdTe thin films for solar cell applications

    NASA Astrophysics Data System (ADS)

    Chander, Subhash; Dhaka, M. S.

    2016-06-01

    A study on impact of post-deposition thermal annealing on the physical properties of CdTe thin films is undertaken in this paper. The thin films of thickness 500 nm were grown on ITO and glass substrates employing thermal vacuum evaporation followed by post-deposition thermal annealing in air atmosphere within low temperature range 150-350 °C. These films were subjected to the XRD, UV-Vis NIR spectrophotometer, source meter, SEM coupled with EDS and AFM for structural, optical, electrical and surface topographical analysis respectively. The diffraction patterns reveal that the films are having zinc-blende cubic structure with preferred orientation along (111) and polycrystalline in nature. The crystallographic parameters are calculated and discussed in detail. The optical band gap is found in the range 1.48-1.64 eV and observed to decrease with thermal annealing. The current-voltage characteristics show that the CdTe films exhibit linear ohmic behavior. The SEM studies show that the as-grown films are homogeneous, uniform and free from defects. The AFM studies reveal that the surface roughness of films is observed to increase with annealing. The experimental results reveal that the thermal annealing has significant impact on the physical properties of CdTe thin films and may be used as absorber layer to the CdTe/CdS thin films solar cells.

  3. Structural and optical analysis of 60Co gamma-irradiated thin films of polycrystalline Ga10Se85Sn5

    NASA Astrophysics Data System (ADS)

    Ahmad, Shabir; Asokan, K.; Shahid Khan, Mohd.; Zulfequar, M.

    2015-12-01

    The present study focuses on the effects of gamma irradiation on structural and optical properties of polycrystalline Ga10Se85Sn5 thin films with a thickness of ∼300 nm deposited by the thermal evaporation technique on cleaned glass substrates. X-ray diffraction patterns of the investigated thin films show that crystallite growth occurs in the orthorhombic phase structure. The surface study carried out by using the scanning electron microscope (SEM) confirms that the grain size increases with gamma irradiation. The optical parameters were estimated from optical transmission spectra data measured from a UV-vis-spectrophotometer in the wavelength range of 200-1100 nm. The refractive index dispersion data of the investigated thin films follow the single oscillator model. The estimated values of static refractive index n0, oscillator strength Ed, zero frequency dielectric constant ε0, optical conductivity σoptical and the dissipation factor increases after irradiation, while the single oscillator energy Eo decreases after irradiation. It was found that the value of the optical band gap of the investigated thin films decreases and the corresponding absorption coefficient increases continuously with an increase in the dose of gamma irradiation. This post irradiation changes in the values of optical band gap and absorption coefficient were interpreted in terms of the bond distribution model.

  4. Formation, optical properties, and electronic structure of thin Yb silicide films on Si(111)

    NASA Astrophysics Data System (ADS)

    Galkin, N. G.; Maslov, A. M.; Polyarnyi, V. O.

    2005-06-01

    Continuous very thin (2.5-3.0 nm) and thin (16-18 nm) ytterbium suicide films with some pinhole density (3×107- 1×108 cm-2) have been formed on Si(111) by solid phase epitaxy (SPE) and reactive deposition epitaxy (RDE) growth methods on templates. The stoichiometric ytterbium suicide (YbSi2) formation has shown in SPE grown films by AES and EELS data. Very thin Yb suicide films grown by RDE method had the silicon enrichment in YbSi2 suicide composition. The analysis of LEED data and AFM imaging has shown that ytterbium suicide films had non-oriented blocks with the polycrystalline structure. The analysis of scanning region length dependencies of the root mean square roughness deviation (σR(L)) for grown suicide films has shown that the formation of ytterbium suicide in SPE and RDE growth methods is determined by the surface diffusion of Yb atoms during the three-dimensional growth process. Optical functions (n, k, α, ɛ1, ɛ2, Im ɛ1-1, neff, ɛeff) of ytterbium silicide films grown on Si(1 1 1) have been calculated from transmittance and reflectance spectra in the energy range of 0.1-6.2 eV. Two nearly discrete absorption bands have been observed in the electronic structure of Yb silicide films with different composition, which connected with interband transitions on divalent and trivalent Yb states. It was established that the reflection coefficient minimum in R-spectra at energies higher 4.2 eV corresponds to the state density minimum in Yb suicide between divalent and trivalent Yb states. It was shown from optical data that Yb silicide films have the semi-metallic properties with low state densities at energies less 0.4 eV and high state densities at 0.5-2.5 eV.

  5. Enhanced in-plane thermoelectric figure of merit in p-type SiGe thin films by nanograin boundaries

    NASA Astrophysics Data System (ADS)

    Lu, Jianbiao; Guo, Ruiqiang; Dai, Weijing; Huang, Baoling

    2015-04-01

    P-Type polycrystalline silicon-germanium (SiGe) thin films are grown by low-pressure chemical vapor deposition (LPCVD) and their thermoelectric properties are characterized from 120 K to 300 K for potential application in integrated microscale cooling. The naturally formed grain boundaries are found to play a crucial role in determining both the charge and thermal transport properties of the films. Particularly, the grain boundaries create energy barriers for charge transport which lead to different dependences of charge mobility on doping concentration and temperature from the bulk counterparts. Meanwhile, the unique columnar grain structures result in remarkable thermal conductivity anisotropy with the in-plane thermal conductivities of SiGe films about 50% lower than the cross-plane values. By optimizing the growth conditions and doping level, a high in-plane figure of merit (ZT) of 0.2 for SiGe films is achieved at 300 K, which is about 100% higher than the previous record for p-type SiGe alloys, mainly due to the significant reduction in the in-plane thermal conductivity caused by nanograin boundaries. The low cost and excellent scalability of LPCVD render these high-performance SiGe films ideal candidates for thin-film thermoelectric applications.P-Type polycrystalline silicon-germanium (SiGe) thin films are grown by low-pressure chemical vapor deposition (LPCVD) and their thermoelectric properties are characterized from 120 K to 300 K for potential application in integrated microscale cooling. The naturally formed grain boundaries are found to play a crucial role in determining both the charge and thermal transport properties of the films. Particularly, the grain boundaries create energy barriers for charge transport which lead to different dependences of charge mobility on doping concentration and temperature from the bulk counterparts. Meanwhile, the unique columnar grain structures result in remarkable thermal conductivity anisotropy with the in

  6. Ultra-high current density thin-film Si diode

    DOEpatents

    Wang; Qi

    2008-04-22

    A combination of a thin-film .mu.c-Si and a-Si:H containing diode structure characterized by an ultra-high current density that exceeds 1000 A/cm.sup.2, comprising: a substrate; a bottom metal layer disposed on the substrate; an n-layer of .mu.c-Si deposited the bottom metal layer; an i-layer of .mu.c-Si deposited on the n-layer; a buffer layer of a-Si:H deposited on the i-layer, a p-layer of .mu.c-Si deposited on the buffer layer; and a top metal layer deposited on the p-layer.

  7. Ultrafast optical control of magnetization dynamics in polycrystalline bismuth doped iron garnet thin films

    NASA Astrophysics Data System (ADS)

    Deb, Marwan; Vomir, Mircea; Rehspringer, Jean-Luc; Bigot, Jean-Yves

    2015-12-01

    Controlling the magnetization dynamics on the femtosecond timescale is of fundamental importance for integrated opto-spintronic devices. For industrial perspectives, it requires to develop simple growth techniques for obtaining large area magneto-optical materials having a high amplitude ultrafast Faraday or Kerr response. Here we report on optical pump probe studies of light induced spin dynamics in high quality bismuth doped iron garnet polycrystalline film prepared by the spin coating method. We demonstrate an ultrafast non-thermal optical control of the spin dynamics using both circularly and linearly polarized pulses.

  8. Impact of Surface Chemistry on Grain Boundary Induced Intrinsic Stress Evolution during Polycrystalline Thin Film Growth

    NASA Astrophysics Data System (ADS)

    Qi, Y.; Sheldon, B. W.; Guo, H.; Xiao, X.; Kothari, A. K.

    2009-02-01

    First principles calculations were integrated with cohesive zone and growth chemistry models to demonstrate that adsorbed species can significantly alter stresses associated with grain boundary formation during polycrystalline film growth. Using diamond growth as an example, the results show that lower substrate temperatures increase the hydrogen content at the surface, which reduces tensile stress, widens the grain boundary separations, and permits additional atom insertions that can induce compressive stress. More generally, this work demonstrates that surface heteroatoms can lead to behavior which is not readily described by existing models of intrinsic stress evolution.

  9. Ultrafast optical control of magnetization dynamics in polycrystalline bismuth doped iron garnet thin films

    SciTech Connect

    Deb, Marwan Vomir, Mircea; Rehspringer, Jean-Luc; Bigot, Jean-Yves

    2015-12-21

    Controlling the magnetization dynamics on the femtosecond timescale is of fundamental importance for integrated opto-spintronic devices. For industrial perspectives, it requires to develop simple growth techniques for obtaining large area magneto-optical materials having a high amplitude ultrafast Faraday or Kerr response. Here we report on optical pump probe studies of light induced spin dynamics in high quality bismuth doped iron garnet polycrystalline film prepared by the spin coating method. We demonstrate an ultrafast non-thermal optical control of the spin dynamics using both circularly and linearly polarized pulses.

  10. CNx/Si thin heterostructures for miniaturized temperature sensors

    NASA Astrophysics Data System (ADS)

    Simeonov, S.; Szekeres, A.; György, E.; Mihailescu, I. N.; Perrone, A.

    2004-05-01

    CNx/Si thin heterostructures were synthesized on Si <111> substrates by XeCl* excimer laser (λ=308 nm, τFWHM≅30 ns) ablation of nuclear grade graphite targets in 5 Pa nitrogen at room temperature. We investigated the current-voltage and capacitance-voltage characteristics of heterostructures obtained at 77 and 300 K. We monitored their conductance and capacitance as a function of the bias voltage applied, in the 100 Hz-1 MHz frequency range. Our results revealed the formation of deep localized electron states both inside the thin CNx films and at the CNx/Si substrate interface. The investigations evidenced that conduction through the CNx/Si thin heterostructure is of trap-assisted tunneling type. The experimental studies show quite a large decrease in capacitance and increase in conductance with the increase of applied frequency. The capacitance of the CNx/Si thin heterostructures increases with a decrease of the temperature. All the results support the potential development of new types of high sensitivity temperature sensors.

  11. Chemical surface modification of polycrystalline platinum thin-films to promote preferential chemisorption of n-hexane, piperidine, and cyclohexane

    SciTech Connect

    Thomas, V.; Schwank, J.; Gland, J.

    1994-12-31

    In this study, hard/soft Lewis acid-base (HSAB) principles are used to modify a thin-polycrystalline platinum film to promote preferential chemisorption of molecules such as piperidine, n-hexane, and cyclohexane. Specifically, the particle size and electron density distribution of the platinum surface is modified using thermal treatment and co-adsorption of electro-positive and negative species. These studies are conducted in an ultra-high vacuum chamber. The platinum surface is characterized, before and after modification protocols, using a variety of in-situ and ex-situ techniques. These include temperature programmed desorption (TPD), both resistance change and work function measurements, and both X-ray photoelectron spectroscopy and diffraction.

  12. Temperature- and doping-concentration-dependent characteristics of junctionless gate-all-around polycrystalline-silicon thin-film transistors

    NASA Astrophysics Data System (ADS)

    Tso, Chia-Tsung; Liu, Tung-Yu; Pan, Fu-Ming; Sheu, Jeng-Tzong

    2017-04-01

    The temperature effects of both gate-all-around polycrystalline silicon nanowire (GAA poly-Si NW) junctionless (JL) and inversion mode (IM) transistor devices at various temperatures (77–410 K) were investigated. The electrical characteristics of these devices, such as subthreshold swing (SS), threshold voltage (V th), and drain-induced barrier lowering (DIBL), were also characterized and compared in this study. Moreover, JL devices with different doping concentrations at various temperatures were also discussed. Both V th and I on showed significant doping concentration dependences for JL devices with doping concentrations of 1 × 1019 and 5 × 1019 cm‑3. However, the electrical characteristics of JL devices showed less thermal sensitivity when the doping concentration reached 1020 cm‑3.

  13. Characterization of ZnO thin films grown on different p-Si substrate elaborated by solgel spin-coating method

    SciTech Connect

    Chebil, W.; Fouzri, A.; Fargi, A.; Azeza, B.; Zaaboub, Z.; and others

    2015-10-15

    Highlights: • High quality ZnO thin films grown on different p-Si substrates were successful obtained by sol–gel process. • PL measurement revealed that ZnO thin film grown on porous Si has the better optical quality. • I–V characteristics for all heterojunctions exhibit successful diode formation. • The diode ZnO/PSi shows a better photovoltaic effect under illumination with a maximum {sub Voc} of 0.2 V. - Abstract: In this study, ZnO thin films are deposited by sol–gel technique on p-type crystalline silicon (Si) with [100] orientation, etched silicon and porous silicon. The structural analyses showed that the obtained thin films were polycrystalline with a hexagonal wurtzite structure and preferentially oriented along the c-axis direction. Morphological study revealed the presence of rounded and facetted grains irregularly distributed on the surface of all samples. PL spectra at room temperature revealed that ZnO thin film grown on porous Si has a strong UV emission with low defects in the visible region comparing with ZnO grown on plat Si and etched Si surface. The heterojunction parameters were evaluated from the (I–V) under dark and illumination at room temperature. The ideality factor, barrier height and series resistance of heterojunction grown on different p-Si substrates are determined by using different methods. Best electrical properties are obtained for ZnO layer deposited on porous silicon.

  14. Elastic wave speeds and moduli in polycrystalline ice Ih, si methane hydrate, and sll methane-ethane hydrate

    USGS Publications Warehouse

    Helgerud, M.B.; Waite, W.F.; Kirby, S.H.; Nur, A.

    2009-01-01

    We used ultrasonic pulse transmission to measure compressional, P, and shear, S, wave speeds in laboratory-formed polycrystalline ice Ih, si methane hydrate, and sll methane-ethane hydrate. From the wave speed's linear dependence on temperature and pressure and from the sample's calculated density, we derived expressions for bulk, shear, and compressional wave moduli and Poisson's ratio from -20 to 15??C and 22.4 to 32.8 MPa for ice Ih, -20 to 15??C and 30.5 to 97.7 MPa for si methane hydrate, and -20 to 10??C and 30.5 to 91.6 MPa for sll methane-ethane hydrate. All three materials had comparable P and S wave speeds and decreasing shear wave speeds with increasing applied pressure. Each material also showed evidence of rapid intergranular bonding, with a corresponding increase in wave speed, in response to pauses in sample deformation. There were also key differences. Resistance to uniaxial compaction, indicated by the pressure required to compact initially porous samples, was significantly lower for ice Ih than for either hydrate. The ice Ih shear modulus decreased with increasing pressure, in contrast to the increase measured in both hydrates ?? 2009.

  15. Metastability of a-SiOx:H thin films for c-Si surface passivation

    NASA Astrophysics Data System (ADS)

    Serenelli, L.; Martini, L.; Imbimbo, L.; Asquini, R.; Menchini, F.; Izzi, M.; Tucci, M.

    2017-01-01

    The adoption of a-SiOx:H films obtained by PECVD in heterojunction solar cells is a key to further increase their efficiency, because of its transparency in the UV with respect to the commonly used a-Si:H. At the same time this layer must guarantee high surface passivation of the c-Si to be suitable in high efficiency solar cell manufacturing. On the other hand the application of amorphous materials like a-Si:H and SiNx on the cell frontside expose them to the mostly energetic part of the sun spectrum, leading to a metastability of their passivation properties. Moreover as for amorphous silicon, thermal annealing procedures are considered as valuable steps to enhance and stabilize thin film properties, when performed at opportune temperature. In this work we explored the reliability of a-SiOx:H thin film layers surface passivation on c-Si substrates under UV exposition, in combination with thermal annealing steps. Both p- and n-type doped c-Si substrates were considered. To understand the effect of UV light soaking we monitored the minority carriers lifetime and Sisbnd H and Sisbnd O bonding, by FTIR spectra, after different exposure times to light coming from a deuterium lamp, filtered to UV-A region, and focused on the sample to obtain a power density of 50 μW/cm2. We found a certain lifetime decrease after UV light soaking in both p- and n-type c-Si passivated wafers according to a a-SiOx:H/c-Si/a-SiOx:H structure. The role of a thermal annealing, which usually enhances the as-deposited SiOx passivation properties, was furthermore considered. In particular we monitored the UV light soaking effect on c-Si wafers after a-SiOx:H coating by PECVD and after a thermal annealing treatment at 300 °C for 30 min, having selected these conditions on the basis of the study of the effect due to different temperatures and durations. We correlated the lifetime evolution and the metastability effect of thermal annealing to the a-SiOx:H/c-Si interface considering the evolution

  16. Estimation of steady-state leakage current in polycrystalline PZT thin films

    NASA Astrophysics Data System (ADS)

    Podgorny, Yury; Vorotilov, Konstantin; Sigov, Alexander

    2016-09-01

    Estimation of the steady state (or "true") leakage current Js in polycrystalline ferroelectric PZT films with the use of the voltage-step technique is discussed. Curie-von Schweidler (CvS) and sum of exponents (Σ exp ) models are studied for current-time J (t) data fitting. Σ exp model (sum of three or two exponents) gives better fitting characteristics and provides good accuracy of Js estimation at reduced measurement time thus making possible to avoid film degradation, whereas CvS model is very sensitive to both start and finish time points and give in many cases incorrect results. The results give rise to suggest an existence of low-frequency relaxation processes in PZT films with characteristic duration of tens and hundreds of seconds.

  17. Polycrystalline ZnTe thin film on silicon synthesized by pulsed laser deposition and subsequent pulsed laser melting

    NASA Astrophysics Data System (ADS)

    Xu, Menglei; Gao, Kun; Wu, Jiada; Cai, Hua; Yuan, Ye; Prucnal, S.; Hübner, R.; Skorupa, W.; Helm, M.; Zhou, Shengqiang

    2016-03-01

    ZnTe thin films on Si substrates have been prepared by pulsed laser deposition and subsequent pulsed laser melting (PLM) treatment. The crystallization during PLM is confirmed by Raman scattering, x-ray diffraction and room temperature photoluminescence (PL) measurements. The PL results show a broad peak at 574 nm (2.16 eV), which can be assigned to the transitions from the conduction band to the acceptor level located at 0.145 eV above the valence band induced by zinc-vacancy ionization. Our work provides an applicable approach to low temperature preparation of crystalline ZnTe thin films.

  18. Role of Polycrystalline Thin-Film PV Technologies in Competitive PV Module Markets: Preprint

    SciTech Connect

    von Roedern, B.; Ullal, H. S.

    2008-05-01

    This paper discusses the developments in thin-film PV technologies and provides an outlook on future commercial module efficiencies achievable based on today's knowledge about champion cell performance.

  19. Cu2+1O coated polycrystalline Si nanoparticles as anode for lithium-ion battery

    NASA Astrophysics Data System (ADS)

    Zhang, Junying; Zhang, Chunqian; Wu, Shouming; Liu, Zhi; Zheng, Jun; Zuo, Yuhua; Xue, Chunlai; Li, Chuanbo; Cheng, Buwen

    2016-04-01

    Cu2+1O coated Si nanoparticles were prepared by simple hydrolysis and were investigated as an anode material for lithium-ion battery. The coating of Cu2+1O on the surface of Si particles remarkably improves the cycle performance of the battery than that made by the pristine Si. The battery exhibits an initial reversible capacity of 3063 mAh/g and an initial coulombic efficiency (CE) of 82.9 %. With a current density of 300 mA/g, its reversible capacity can remains 1060 mAh/g after 350 cycles, corresponding to a CE ≥ 99.8 %. It is believed that the Cu2+1O coating enhances the electrical conductivity, and the elasticity of Cu2+1O further helps buffer the volume changes during lithiation/delithiation processes. Experiment results indicate that the electrode maintained a highly integrated structure after 100 cycles and it is in favour of the formation of stable solid electrolyte interface (SEI) on the Si surface to keep the extremely high CE during long charge and discharge cycles.

  20. Cu2+1O coated polycrystalline Si nanoparticles as anode for lithium-ion battery.

    PubMed

    Zhang, Junying; Zhang, Chunqian; Wu, Shouming; Liu, Zhi; Zheng, Jun; Zuo, Yuhua; Xue, Chunlai; Li, Chuanbo; Cheng, Buwen

    2016-12-01

    Cu2+1O coated Si nanoparticles were prepared by simple hydrolysis and were investigated as an anode material for lithium-ion battery. The coating of Cu2+1O on the surface of Si particles remarkably improves the cycle performance of the battery than that made by the pristine Si. The battery exhibits an initial reversible capacity of 3063 mAh/g and an initial coulombic efficiency (CE) of 82.9 %. With a current density of 300 mA/g, its reversible capacity can remains 1060 mAh/g after 350 cycles, corresponding to a CE ≥ 99.8 %. It is believed that the Cu2+1O coating enhances the electrical conductivity, and the elasticity of Cu2+1O further helps buffer the volume changes during lithiation/delithiation processes. Experiment results indicate that the electrode maintained a highly integrated structure after 100 cycles and it is in favour of the formation of stable solid electrolyte interface (SEI) on the Si surface to keep the extremely high CE during long charge and discharge cycles.

  1. Active pixel imagers incorporating pixel-level amplifiers based on polycrystalline-silicon thin-film transistors.

    PubMed

    El-Mohri, Youcef; Antonuk, Larry E; Koniczek, Martin; Zhao, Qihua; Li, Yixin; Street, Robert A; Lu, Jeng-Ping

    2009-07-01

    Active matrix, flat-panel imagers (AMFPIs) employing a 2D matrix of a-Si addressing TFTs have become ubiquitous in many x-ray imaging applications due to their numerous advantages. However, under conditions of low exposures and/or high spatial resolution, their signal-to-noise performance is constrained by the modest system gain relative to the electronic additive noise. In this article, a strategy for overcoming this limitation through the incorporation of in-pixel amplification circuits, referred to as active pixel (AP) architectures, using polycrystalline-silicon (poly-Si) TFTs is reported. Compared to a-Si, poly-Si offers substantially higher mobilities, enabling higher TFT currents and the possibility of sophisticated AP designs based on both n- and p-channel TFTs. Three prototype indirect detection arrays employing poly-Si TFTs and a continuous a-Si photodiode structure were characterized. The prototypes consist of an array (PSI-1) that employs a pixel architecture with a single TFT, as well as two arrays (PSI-2 and PSI-3) that employ AP architectures based on three and five TFTs, respectively. While PSI-1 serves as a reference with a design similar to that of conventional AMFPI arrays, PSI-2 and PSI-3 incorporate additional in-pixel amplification circuitry. Compared to PSI-1, results of x-ray sensitivity demonstrate signal gains of approximately 10.7 and 20.9 for PSI-2 and PSI-3, respectively. These values are in reasonable agreement with design expectations, demonstrating that poly-Si AP circuits can be tailored to provide a desired level of signal gain. PSI-2 exhibits the same high levels of charge trapping as those observed for PSI-1 and other conventional arrays employing a continuous photodiode structure. For PSI-3, charge trapping was found to be significantly lower and largely independent of the bias voltage applied across the photodiode. MTF results indicate that the use of a continuous photodiode structure in PSI-1, PSI-2, and PSI-3 results in

  2. Active pixel imagers incorporating pixel-level amplifiers based on polycrystalline-silicon thin-film transistors

    PubMed Central

    El-Mohri, Youcef; Antonuk, Larry E.; Koniczek, Martin; Zhao, Qihua; Li, Yixin; Street, Robert A.; Lu, Jeng-Ping

    2009-01-01

    Active matrix, flat-panel imagers (AMFPIs) employing a 2D matrix of a-Si addressing TFTs have become ubiquitous in many x-ray imaging applications due to their numerous advantages. However, under conditions of low exposures and∕or high spatial resolution, their signal-to-noise performance is constrained by the modest system gain relative to the electronic additive noise. In this article, a strategy for overcoming this limitation through the incorporation of in-pixel amplification circuits, referred to as active pixel (AP) architectures, using polycrystalline-silicon (poly-Si) TFTs is reported. Compared to a-Si, poly-Si offers substantially higher mobilities, enabling higher TFT currents and the possibility of sophisticated AP designs based on both n- and p-channel TFTs. Three prototype indirect detection arrays employing poly-Si TFTs and a continuous a-Si photodiode structure were characterized. The prototypes consist of an array (PSI-1) that employs a pixel architecture with a single TFT, as well as two arrays (PSI-2 and PSI-3) that employ AP architectures based on three and five TFTs, respectively. While PSI-1 serves as a reference with a design similar to that of conventional AMFPI arrays, PSI-2 and PSI-3 incorporate additional in-pixel amplification circuitry. Compared to PSI-1, results of x-ray sensitivity demonstrate signal gains of ∼10.7 and 20.9 for PSI-2 and PSI-3, respectively. These values are in reasonable agreement with design expectations, demonstrating that poly-Si AP circuits can be tailored to provide a desired level of signal gain. PSI-2 exhibits the same high levels of charge trapping as those observed for PSI-1 and other conventional arrays employing a continuous photodiode structure. For PSI-3, charge trapping was found to be significantly lower and largely independent of the bias voltage applied across the photodiode. MTF results indicate that the use of a continuous photodiode structure in PSI-1, PSI-2, and PSI-3 results in optical fill

  3. Low loss (approximately 6.45dB/cm) sub-micron polycrystalline silicon waveguide integrated with efficient SiON waveguide coupler.

    PubMed

    Fang, Q; Song, J F; Tao, S H; Yu, M B; Lo, G Q; Kwong, D L

    2008-04-28

    In this communication, the sub-micron size polycrystalline silicon (poly- Si) single mode waveguides are fabricated and integrated with SiON waveguide coupler by deep UV lithography. The propagation loss of poly-Si waveguide and coupling loss with optical flat polarization-maintaining fiber (PMF) are measured. For whole C-band (i.e., lambda approximately 1520-1565nm), the propagation loss of TE mode is measured to approximately 6.45+/-0.3dB/cm. The coupling loss with optical flat PMF is approximately 3.4dB/facet for TE mode. To the best of our knowledge, the propagation loss is among the best reported results. This communication discusses the factors reducing the propagation loss, especially the effect of the refractive index contrast. Compared to the SiO(2) cladding, poly-Si waveguide with SiON cladding exhibits lower propagation loss.

  4. Resistance behavior of Cr-Si-O thin films

    SciTech Connect

    Jankowski, A.F.; Hayes, J.P.; Musket, R.; Cosandey, F.; Gorla, C.E.; Besser, R.S.; Westerlind, V.; Cobai, G.

    1996-10-23

    Thin coatings of Cr-Si-O are assessed for use as a resistor. The submicron thick films are sputter deposited using a (l-x)Ar-(x)O{sub 2} working gas. Several compacts of metal and oxide powders are commercially prepared for use as the sputter targets. The deposition process yields film compositions which range from 2 to 30 at.% Cr and 20 to 45 at.% Si as measured using Rutherford backscattering. A broad range of resistivities from 10{sup 1} to 10{sup 14}{Omega} cm are found as measured through the film thickness between metal pads deposited onto the Cr-Si-O surface. The film structure and morphology are characterized using transmission electron microscopy from which the resistance behavior can be correlated to the distribution of metallic particles. Thermal aging reveals the metastability of the Cr- Si-O film morphology and resistance behavior.

  5. Engineering helimagnetism in MnSi thin films

    SciTech Connect

    Zhang, S. L.; Hesjedal, T.; Chalasani, R.; Kohn, A.; Baker, A. A.; Steinke, N.-J.; Figueroa, A. I.; Laan, G. van der

    2016-01-15

    Magnetic skyrmion materials have the great advantage of a robust topological magnetic structure, which makes them stable against the superparamagnetic effect and therefore a candidate for the next-generation of spintronic memory devices. Bulk MnSi, with an ordering temperature of 29.5 K, is a typical skyrmion system with a propagation vector periodicity of ∼18 nm. One crucial prerequisite for any kind of application, however, is the observation and precise control of skyrmions in thin films at room-temperature. Strain in epitaxial MnSi thin films is known to raise the transition temperature to 43 K. Here we show, using magnetometry and x-ray spectroscopy, that the transition temperature can be raised further through proximity coupling to a ferromagnetic layer. Similarly, the external field required to stabilize the helimagnetic phase is lowered. Transmission electron microscopy with element-sensitive detection is used to explore the structural origin of ferromagnetism in these Mn-doped substrates. Our work suggests that an artificial pinning layer, not limited to the MnSi/Si system, may enable room temperature, zero-field skyrmion thin-film systems, thereby opening the door to device applications.

  6. Thermoelectric Properties of Epitaxial β-FeSi2 Thin Films on Si(111) and Approach for Their Enhancement

    NASA Astrophysics Data System (ADS)

    Taniguchi, Tatsuhiko; Sakane, Shunya; Aoki, Shunsuke; Okuhata, Ryo; Ishibe, Takafumi; Watanabe, Kentaro; Suzuki, Takeyuki; Fujita, Takeshi; Sawano, Kentarou; Nakamura, Yoshiaki

    2016-10-01

    We have investigated the intrinsic thermoelectric properties of epitaxial β-FeSi2 thin films and the impact of phosphorus (P) doping. Epitaxial β-FeSi2 thin films with single phase were grown on Si(111) substrates by two different techniques in an ultrahigh-vacuum molecular beam epitaxy (MBE) system: solid-phase epitaxy (SPE), where iron silicide films formed by codeposition of Fe and Si at room temperature were recrystallized by annealing at 530°C to form epitaxial β-FeSi2 thin films on Si(111) substrates, and MBE of β-FeSi2 thin films on epitaxial β-FeSi2 templates formed on Si(111) by reactive deposition epitaxy (RDE) at 530°C (RDE + MBE). Epitaxial SPE thin films based on codeposition had a flatter surface and more abrupt β-FeSi2/Si(111) interface than epitaxial RDE + MBE thin films. We investigated the intrinsic thermoelectric properties of the epitaxial β-FeSi2 thin films on Si(111), revealing lower thermal conductivity and higher electrical conductivity compared with bulk β-FeSi2. We also investigated the impact of doping on the Seebeck coefficient of bulk and thin-film β-FeSi2. A route to enhance the thermoelectric performance of β-FeSi2 is proposed, based on (1) fabrication of thin-film structures for high electrical conductivity and low thermal conductivity, and (2) proper choice of doping for high Seebeck coefficient.

  7. Progress Toward a Stabilization and Preconditioning Protocol for Polycrystalline Thin-Film Photovoltaic Modules

    SciTech Connect

    del Cueto, J. A.; Deline, C. A.; Rummel, S. R.; Anderberg, A.

    2010-08-01

    Cadmium telluride (CdTe) and copper indium gallium diselenide (CIGS) thin-film photovoltaic (PV) modules can exhibit substantial variation in measured performance depending on prior exposure history. This study examines the metastable performance changes in these PV modules with the goal of establishing standard preconditioning or stabilization exposure procedures to mitigate measured variations prior to current-voltage (IV) measurements.

  8. Bend stress relaxation and tensile primary creep of a polycrystalline alpha-SiC fiber

    NASA Technical Reports Server (NTRS)

    Hee Man, Yun; Goldsby, Jon C.; Morscher, Gregory N.

    1995-01-01

    Understanding the thermomechanical behavior (creep and stress relaxation) of ceramic fibers is of both practical and basic interest. On the practical level, ceramic fibers are the reinforcement for ceramic matrix composites which are being developed for use in high temperature applications. It is important to understand and model the total creep of fibers at low strain levels where creep is predominantly in the primary stage. In addition, there are many applications where the component will only be subjected to thermal strains. Therefore, the stress relaxation of composite consituents in such circumstances will be an important factor in composite design and performance. The objective of this paper is to compare and analyze bend stress relaxation and tensile creep data for alpha-SiC fibers produced by the Carborundum Co. (Niagara Falls, NY). This fiber is of current technical interest and is similar in composition to bulk alpha-SiC which has been studied under compressive creep conditions. The temperature, time, and stress dependences will be discussed for the stress relaxation and creep results. In addition, some creep and relaxation recovery experiments were performed in order to understand the complete viscoelastic behavior, i.e. both recoverable and nonrecoverable creep components of these materials. The data will be presented in order to model the deformation behavior and compare relaxation and/or creep behavior for relatively low deformation strain conditions of practical concern. Where applicable, the tensile creep results will be compared to bend stress relaxation data.

  9. Surface structure of thin pseudomorphous GeSi layers

    NASA Astrophysics Data System (ADS)

    Nikiforov, A. I.; Timofeev, V. F.; Pchelyakov, O. P.

    2015-11-01

    Reflection high-energy electron diffraction (RHEED) was used to study the evolution of thin GexSi1-x film surface superstructures s in the course of molecular beam epitaxy. The (2 × N) superstructure of the epitaxial film surface at periodicity N from 14 to 8, the latter being characteristic of pure germanium at the Si(1 0 0) surface. The epitaxial film thickness that is required for the formation of the (2 × 8) superstructure depends on the deposition temperature and germanium content in the solid solution. The germanium segregation on the growing film surface is shown to be responsible for the observed superstructural changes.

  10. Epitaxial ternary RexMo1 - xSi2 thin films on Si(100)

    NASA Astrophysics Data System (ADS)

    Vantomme, André; Nicolet, Marc-A.; Long, Robert G.; Mahan, John E.

    1994-04-01

    Reactive deposition epitaxy was used to synthesize thin layers of RexMo1-xSi2 on Si(100). In the case of x=1, ReSi2 layers of excellent crystalline quality have been reported previously [J. E. Mahan, K. M. Geib, G. Y. Robinson, R. G. Long, Y. Xinghua, G. Bai, and M.-A. Nicolet, Appl. Phys. Lett. 56, 2439 (1990)]. In the case of x=0, however, virtually no alignment of the MoSi2 and the substrate is found, although this silicide is nearly isomorphic to ReSi2. For intermediate values of x, highly epitaxial ternary silicides are obtained, at least for a Mo fraction up to 1/3.

  11. Hot Extruded Polycrystalline Mg2Si with Embedded XS2 Nano-particles (X: Mo, W)

    NASA Astrophysics Data System (ADS)

    Bercegol, A.; Christophe, V.; Keshavarz, M. K.; Vasilevskiy, D.; Turenne, S.; Masut, R. A.

    2016-08-01

    Due to their abundant, inexpensive and non-toxic constituent elements, magnesium silicide and related alloys are attractive for large-scale thermoelectric (TE) applications in the 500-800 K temperature range, in particular for energy conversion. In this work, we propose a hot extrusion method favorable for large-scale production, where the starting materials (Mg2Si and XS2, X: W, Mo) are milled together in a sealed vial. The MoS2 nano-particles (0.5-2 at.%) act as solid lubricant during the extrusion process, thus facilitating material densification, as confirmed by density measurements based on Archimedes' method. Scanning electron microscopy images of bulk extruded specimens show a wide distribution of grain size, covering the range from 0.1 μm to 10 μm, and energy dispersive spectroscopy shows oxygen preferentially distributed at the grain boundaries. X-ray diffraction analysis shows that the major phase is the expected cubic structure of Mg2Si. The TE properties of these extruded alloys have been measured by the Harman method between 300 K and 700 K. Resistivity values at 700 K vary between 370 μΩ m and 530 μΩ m. The ZT value reaches a maximum of 0.26 for a sample with 2 at.% MoS2. Heat conductivity is reduced for extruded samples containing MoS2, which most likely behave as scattering centers for phonons. The reason why the WS2 particles do not bring any enhancement, for either densification or heat transfer reduction, might be linked to their tendency to agglomerate. These results open the way for further investigation to optimize the processing parameters for this family of TE alloys.

  12. Structural and optical properties of (Ag,Cu)(In,Ga)Se{sub 2} polycrystalline thin film alloys

    SciTech Connect

    Boyle, J. H.; Shafarman, W. N.; Birkmire, R. W.; McCandless, B. E.

    2014-06-14

    The structural and optical properties of pentenary alloy (Ag,Cu)(In,Ga)Se{sub 2} polycrystalline thin films were characterized over the entire compositional range at a fixed (Cu + Ag)/(In + Ga) ratio. Films deposited at 550 °C on bare and molybdenum coated soda-lime glass by elemental co-evaporation in a single-stage process with constant incident fluxes exhibit single phase chalcopyrite structure, corresponding to 122 spacegroup (I-42d) over the entire compositional space. Unit cell refinement of the diffraction patterns show that increasing Ag substitution for Cu, the refined a{sub o} lattice constant, (Ag,Cu)-Se bond length, and anion displacement increase in accordance with the theoretical model proposed by Jaffe, Wei, and Zunger. However, the refined c{sub o} lattice constant and (In,Ga)-Se bond length deviated from theoretical expectations for films with mid-range Ag and Ga compositions and are attributed to influences from crystallographic bond chain ordering or cation electronegativity. The optical band gap, derived from transmission and reflection measurements, widened with increasing Ag and Ga content, due to influences from anion displacement and cation electronegativity, as expected from theoretical considerations for pseudo-binary chalcopyrite compounds.

  13. Tunable thermal conductivity of thin films of polycrystalline AlN by structural inhomogeneity and interfacial oxidation.

    PubMed

    Jaramillo-Fernandez, J; Ordonez-Miranda, J; Ollier, E; Volz, S

    2015-03-28

    The effect of the structural inhomogeneity and oxygen defects on the thermal conductivity of polycrystalline aluminum nitride (AlN) thin films deposited on single-crystal silicon substrates is experimentally and theoretically investigated. The influence of the evolution of crystal structure, grain size, and out-of plane disorientation along the cross plane of the films on their thermal conductivity is analyzed. The impact of oxygen-related defects on thermal conduction is studied in AlN/AlN multilayered samples. Microstructure, texture, and grain size of the films were characterized by X-ray diffraction and scanning and transmission electron microscopy. The measured thermal conductivity obtained with the 3-omega technique for a single and multiple layers of AlN is in fairly good agreement with the theoretical predictions of our model, which is developed by considering a serial assembly of grain distributions. An effective thermal conductivity of 5.92 W m(-1) K(-1) is measured for a 1107.5 nm-thick multilayer structure, which represents a reduction of 20% of the thermal conductivity of an AlN monolayer with approximately the same thickness, due to oxygen impurities at the interface of AlN layers. Our results show that the reduction of the thermal conductivity as the film thickness is scaled down, is strongly determined by the structural inhomogeneities inside the sputtered films. The origin of this non-homogeneity and the effect on phonon scattering are also discussed.

  14. Cu-dependent phase transition in polycrystalline CuGaSe2 thin films grown by three-stage process

    NASA Astrophysics Data System (ADS)

    Islam, M. M.; Yamada, A.; Sakurai, T.; Kubota, M.; Ishizuka, S.; Matsubara, K.; Niki, S.; Akimoto, K.

    2011-07-01

    The Cu-dependent phase transition in polycrystalline CuGaSe2 thin films has been studied by an electron probe micro-analyzer (EPMA) and the synchrotron x-ray diffraction method. A Cu-deficiency parameter, Z, defined as (1 - Cu/Ga) was used to study the phase transition. Upon increasing the Z-value, the composition of the films on the Cu2Se-Ga2Se3 pseudo binary tie line was found to shift from the stoichiometric CuGaSe2 (1:1:2) (Z = 0) to the Ga-rich composition through the formation of several ordered defect compounds.The structural modification in the Cu-poor CuGaSe2 film has been investigated by the synchrotron x-ray diffraction method. The existence of the Cu-poor surface phase over the near-stoichiometric bulk CuGaSe2 film was confirmed by the fitting of the accelerated voltage dependent EPMA data.

  15. Development of tandem cells consisting of GaAs single crystal and CuInSe2/CdZnS polycrystalline thin films

    NASA Astrophysics Data System (ADS)

    Kim, Namsoo P.; Stanbery, Billy J.; Gale, Ronald P.; McClelland, Robert W.

    1989-04-01

    The tandem cells consisting of GaAs single crystal and CuInSe2 polycrystalline thin films are being developed under the joint program of the Boeing Co. and Kopin Corp. to meet the increasing power needs for future spacecraft. The updated status of this program is presented along with experimental results such as cell performance, and radiation resistance. Other cell characteristics including the specific power of and the interconnect options for this tandem cell approach are also discussed.

  16. Development of tandem cells consisting of GaAs single crystal and CuInSe2/CdZnS polycrystalline thin films

    NASA Technical Reports Server (NTRS)

    Kim, Namsoo P.; Stanbery, Billy J.; Gale, Ronald P.; Mcclelland, Robert W.

    1989-01-01

    The tandem cells consisting of GaAs single crystal and CuInSe2 polycrystalline thin films are being developed under the joint program of the Boeing Co. and Kopin Corp. to meet the increasing power needs for future spacecraft. The updated status of this program is presented along with experimental results such as cell performance, and radiation resistance. Other cell characteristics including the specific power of and the interconnect options for this tandem cell approach are also discussed.

  17. Metal-organic chemical vapour deposition of polycrystalline tetragonal indium sulphide (InS) thin films

    NASA Technical Reports Server (NTRS)

    Macinnes, Andrew N.; Cleaver, William M.; Barron, Andrew R.; Power, Michael B.; Hepp, Aloysius F.

    1992-01-01

    The dimeric indium thiolate /(t Bu)2In(mu-S sup t Bu)/2 has been used as a single-source precursor for the MOCVD of InS thin films. The dimeric In2S2 core is proposed to account for the formation of the nonequilibrium high-pressure tetragonal phase in the deposited films. Analysis of the deposited films has been obtained by TEM, with associated energy-dispersive X-ray analysis and X-ray photoelectron spectroscopy.

  18. Wear resistance of TiAlSiN thin coatings.

    PubMed

    Silva, F J G; Martinho, R P; Alexandre, R J D; Baptista, A P M

    2012-12-01

    In the last decades TiAIN coatings deposited by PVD techniques have been extensively investigated but, nowadays, their potential development for tribological applications is relatively low. However, new coatings are emerging based on them, trying to improve wear behavior. TiAlSiN thin coatings are now investigated, analyzing if Si introduction increases the wear resistance of PVD films. Attending to the application, several wear test configurations has been recently used by some researchers. In this work, TiAISiN thin coatings were produced by PVD Unbalanced Magnetron Sputtering technique and they were conveniently characterized using Scanning Electron Microscopy (SEM) provided with Energy Dispersive Spectroscopy (EDS), Atomic Force Microscopy (AFM), Electron Probe Micro-Analyzer (EPMA), Micro Hardness (MH) and Scratch Test Analysis. Properties as morphology, thickness, roughness, chemical composition and structure, hardness and film adhesion to the substrate were investigated. Concerning to wear characterization, two very different ways were chosen: micro-abrasion with ball-on-flat configuration and industrial non-standardized tests based on samples inserted in a feed channel of a selected plastic injection mould working with 30% (wt.) glass fiber reinforced polypropylene. TiAISiN coatings with a small amount of about 5% (wt.) Si showed a similar wear behavior when compared with TiAIN reported performances, denoting that Si addition does not improve the wear performance of the TiAIN coatings in these wear test conditions.

  19. Tutorial: Understanding residual stress in polycrystalline thin films through real-time measurements and physical models

    NASA Astrophysics Data System (ADS)

    Chason, Eric; Guduru, Pradeep R.

    2016-05-01

    Residual stress is a long-standing issue in thin film growth. Better understanding and control of film stress would lead to enhanced performance and reduced failures. In this work, we review how thin film stress is measured and interpreted. The results are used to describe a comprehensive picture that is emerging of what controls stress evolution. Examples from multiple studies are discussed to illustrate how the stress depends on key parameters (e.g., growth rate, material type, temperature, grain size, morphology, etc.). The corresponding stress-generating mechanisms that have been proposed to explain the data are also described. To develop a fuller understanding, we consider the kinetic factors that determine how much each of these processes contributes to the overall stress under different conditions. This leads to a kinetic model that can predict the dependence of the stress on multiple parameters. The model results are compared with the experiments to show how this approach can explain many features of stress evolution.

  20. polycrystalline ceramics

    NASA Astrophysics Data System (ADS)

    Cai, Yunqi; Ma, Ji; Cui, Qi; Wang, Wenzhang; Zhang, Hui; Chen, Qingming

    2014-12-01

    La2/3Ca1/3MnO3 polycrystalline ceramics were synthesized by sol-gel method. Sharp temperature coefficient of resistance (TCR) variation (with peak value up to 22 %) has been observed near the metal-insulator transition temperature T MI (273 K) for the sample sintered at 1,450 °C. This TCR value is much higher than the previously reported values for the undoped and Ag-doped La0.67Ca0.33MnO3 samples and is comparable to the optimized thin films. It was concluded that the improved physical properties of the La0.67Ca0.33MnO3 material are due to its improved microstructure and homogeneity.

  1. Electrochemical photovoltaic and photoelectrochemical storage cells based on II-VI polycrystalline thin film materials

    SciTech Connect

    Wallace, W.L.

    1983-06-01

    Research on electrochemical photovoltaic cells incorporating thin film CdSe and CdSe /SUB x/ Te /SUB 1-x/ photoanodes has progressed to the point where efficiencies of up to 7% can be achieved on small area electrodes using a polysulfide electrolyte. Higher efficiencies can be obtained in alternate electrolytes in significantly less stable systems. The major limitations on cell efficiency are associated with the open circuit voltage and fill factor. At present, the most promising photoelectrochemical storage system is an in situ three electrode cell which consists of an n-CdSe /SUB x/ Te /SUB 1-x/ photoanode and CoS counterelectrode in a sulfide/polysulfide electrolyte and a Sn/SnS storage electrode isolated in an aqueous sulfide electrolyte.

  2. Research on polycrystalline thin-film CuGaInSe2 solar cells

    NASA Astrophysics Data System (ADS)

    Stanbery, B. J.; Chen, W. S.; Devaney, W. E.; Stewart, J. W.

    1992-11-01

    This report describes research to fabricate high-efficiency CdZnS/CuInGaSe2 (CIGS) thin-film solar cells, and to develop improved transparent conductor window layers such as ZnO. A specific technical milestone was the demonstration of an air mass (AM) 1.5 global, 13 percent efficient, 1-sq cm total-area CIGS thin-film solar cell. Our activities focused on three areas. First, a CIGS deposition system was modified to double its substrate capacity, thus increasing throughput, which is critical to speeding the process development by providing multiple substrates from the same CIGS run. Second, new tooling was developed to enable an investigation of a modified aqueous CdZnS process. The goal was to improve the yield of this critical step in the device fabrication process. Third, our ZnO sputtering system was upgraded to improve its reliability, and the sputtering parameters were further optimized to improve its properties as a transparent conducting oxide. The characterization of the new CIGS deposition system substrate fixturing was completed, and we produced good thermal uniformity and adequately high temperatures for device-quality CIGS deposition. Both the CIGS and ZnO deposition processes were refined to yield a ZnO / Cd(0.82)Zn(0.18)S / CuIn(0.80)Ga(0.20)Se2 cell that was verified at NREL under standard testing conditions at 13.1 percent efficiency with V(sub oc) = 0.581 V, J(sub sc) = 34.8 mA/sq cm, FF = 0.728, and a cell area of 0.979 sq cm.

  3. Research on polycrystalline thin-film CuInGaSe2 solar cells

    NASA Astrophysics Data System (ADS)

    Chen, W. S.; Stewart, J. M.; Mickelsen, R. A.; Devaney, W. E.; Stanbery, B. J.

    1993-10-01

    This report describes work to fabricate high-efficiency CdZnS/CuInGaSe2, thin-film solar cells and to develop improved transparent conductor window layers such as ZnO. The specific technical milestone for Phase 1 was to demonstrate an air mass (AM) 1.5 global 13% , 1-cm(exp 2) total-area CuInGaSe2 (CIGS) thin-film solar cell. For Phase 2, the objective was to demonstrate an AM1.5 global 13.5%, 1-cm(exp 2) total-area efficiency. We focused our activities on three areas. First, we modified the CIGS deposition system to double its substrate capacity. Second, we developed new tooling to enable investigation of a modified aqueous CdZnS process in which the goal was to improve the yield of this critical step in the device fabrication process. Third, we upgraded the ZnO sputtering system to improve its reliability and reproducibility. A dual rotatable cathode metallic source was installed, and the sputtering parameters were further optimized to improve ZnO's properties as a transparent conducting oxide (TCO). Combining the refined CdZnS process with CIGS from the newly fixtured deposition system enable us to fabricate and deliver a ZnO/Cd(0.08)Zn(0.20)S/CuIn(0.74)Ga(0.26)Se2 cell on alumina with I-V characteristics, as measured by NREL under standard test conditions, of 13.7% efficiency with V(proportional to) = 0.5458 V, J(sub sc) = 35.48 mA/cm(exp 2), FF = 0.688, and efficiency = 14.6%.

  4. Thermally Stimulated Luminescence of hbox {Y}2{Si}{O}5{:} {Ce}^{3+} Commercial Phosphor Powder and Thin Films

    NASA Astrophysics Data System (ADS)

    Debelo, N. G.; Dejene, F. B.; Roro, Kittessa

    2016-07-01

    We report on the thermoluminescence (TL) properties of hbox {Y}2{Si}{O}5{:} {Ce}^{3+} phosphor powder and thin films. For the phosphor powder, the TL intensity increases with an increase in UV dose for up to 20 min and then decreases. The TL intensity peak shifts slightly to higher-temperature region at relatively high heating rates, but with reduced peak intensity. Important TL kinetic parameters, such as the activation energy ( E) and the frequency factor ( s), were calculated from the glow curves using a variable heating rate method, and it was found that the glow peaks obey first-order kinetics. For the films, broad TL emissions over a wide temperature range with reduced intensity relative to that of the powder were observed. The maxima of the TL glow peaks of the films deposited in oxygen ambient and vacuum shift toward higher temperature relative to the TL peak position of the film deposited in an argon environment. Vacuum environment resulted in the formation of a deep trap relative to oxygen and argon environments. Furthermore, the structure of hbox {Y}2{Si}{O}5{:} {Ce}^{3+} phosphor powder transformed from {x}2-monoclinic polycrystalline phase to {x}1-monoclinic polycrystalline phase, for deposition at low substrate temperature.

  5. Elasticity of Polycrystalline Pyrope (Mg3Al2Si3O12) to 9 GPa and 1000°C

    SciTech Connect

    Gwanmesia,G.; Zhang, J.; Darling, K.; Kung, J.; Li, B.; Wang, L.; Neuville, D.; Liebermann, R.

    2006-01-01

    Acoustic wave velocities for synthetic polycrystalline pyrope (Mg3Al2Si3O12) were measured to 9 GPa and temperatures up to 1000 C by ultrasonic interferometry combined with energy-dispersive synchrotron X-ray diffraction in a cubic-anvil DIA-type apparatus (SAM-85). Specimen lengths at high pressures (P) and temperatures (T) are directly measured by X-radiographic methods. Elastic wave travel times and X-ray diffraction data were collected after heating and cooling at high pressures to minimize effect of non-hydrostatic stress on the measurements. A linear fit to the high P and T data set yields the elastic bulk and shear moduli [KS = 175 (2) GPa; G = 91 (1) GPa] and their pressure and temperature derivatives [K'S=3.9{+-}0.3; G' = 1.7 {+-} 0.2 and ({partial_derivative}KS/{partial_derivative}T)P = -18 (2) MPa/K; ({partial_derivative}G/{partial_derivative}T)P = -10 (1) MPa/K]. In a separate analysis, the pressure-volume-temperature data collected during these acoustic experiments were fit to a high temperature Birch-Murnaghan (HTBM) equation [with K' fixed at 3.9] and to each isothermal P-V-T data yielding ({partial_derivative}KT/{partial_derivative}T)P = -22 (2) MPa/K and ({partial_derivative}KT/{partial_derivative}T)P = -20 (5) MPa/K, respectively. Comparison of Py100 data with those other Py-Mj compositions indicates that the thermo elastic properties are insensitive to majorite content in the garnet along the pyrope-majorite join.

  6. Elasticity of Polycrystalline Pyrope (Mg3Al2Si3O12) to 9 GPa and 1000 degrees C

    SciTech Connect

    Gwanmesia,G.; Zhang, J.; Darling, K.; Kung, J.; Li, B.; Wang, L.; Neuville, D.; Liebermann, R.

    2006-01-01

    Acoustic wave velocities for synthetic polycrystalline pyrope (Mg{sub 3}Al{sub 2}Si{sub 3}O{sub 12}) were measured to 9 GPa and temperatures up to 1000 degrees C by ultrasonic interferometry combined with energy-dispersive synchrotron X-ray diffraction in a cubic-anvil DIA-type apparatus (SAM-85). Specimen lengths at high pressures (P) and temperatures (T) are directly measured by X-radiographic methods. Elastic wave travel times and X-ray diffraction data were collected after heating and cooling at high pressures to minimize effect of non-hydrostatic stress on the measurements. A linear fit to the high P and T data set yields the elastic bulk and shear moduli [K{sub S} = 175 (2) GPa; G = 91 (1) GPa] and their pressure and temperature derivatives [K{prime}{sub S}=3.9{+-}0.3; G{prime} = 1.7 {+-} 0.2 and ({partial_derivative}K{sub S}/{partial_derivative}T){sub P} = -18 (2) MPa/K; ({partial_derivative}G/{partial_derivative}T){sub P} = -10 (1) MPa/K]. In a separate analysis, the pressure-volume-temperature data collected during these acoustic experiments were fit to a high temperature Birch-Murnaghan (HTBM) equation [with K{prime} fixed at 3.9] and to each isothermal P-V-T data yielding ({partial_derivative}K{sub T}/{partial_derivative}T){sub P} = -22 (2) MPa/K and ({partial_derivative}K{sub T}/{partial_derivative}T){sub P} = -20 (5) MPa/K, respectively. Comparison of Py{sub 100} data with those other Py-Mj compositions indicates that the thermo elastic properties are insensitive to majorite content in the garnet along the pyrope-majorite join.

  7. Recrystallization of Ge thin film on SiO2 substrates using a two-step annealing process

    NASA Astrophysics Data System (ADS)

    Kim, Sung Wook; Lee, Jaejun; Park, Youn Ho; Park, Jeong Min; Do, Hong Kyeong; Kim, Yeon Joo; Choi, Heon-Jin

    2017-01-01

    The fabrication of high-quality crystalline germanium thin films (GeTF) on an amorphous SiO2 layer is crucial for the realization of high performance-, low cost III-V solar cells used in many applications. Herein, we report the growth of a high-quality crystalline GeTF on SiO2/Si substrates using an ultra-vacuum chemical vapor deposition (UHV-CVD) method. GeTF was grown on the SiO2 layer using a two-step growth and multi-annealing processes. The fabrication method involved the deposition of a 1st seeding layer, annealing, and deposition of a 2nd main layer followed by three times of cyclic annealing. The crystallization of the seeding layer having a thickness of less than 10 nm could be ascribed to the evolution of polycrystalline structures in the main layer. The cyclic annealing performed after the deposition of the main layer is also found to be crucial for the formation of single crystalline, high-quality Ge films on SiO2 substrates with <311> direction. The cyclic annealing results in a further reduction of the defects, thereby threading dislocations significantly to a density of 5.311 × 107 cm-2. Electrical measurements using the van der Pauw method revealed that the GeTF exhibits p-type characteristics and a high mobility of 360.10 cm2/Vs at room temperature. [Figure not available: see fulltext.

  8. Thin film polycrystalline silicon solar cells: first technical progress report, April 15, 1980-July 15, 1980

    SciTech Connect

    1980-07-01

    The objectives of this contract are to fabricate large area thin film silicon solar cells with AM1 efficiency of 10% or greater with good reproducibility and good yield and to assess the feasibility of implementing this process for manufacturing solar cells at a cost of $300/kWe. Efforts during the past quarter have been directed to the purification of metallurgical silicon, the preparation of substrates, and the fabrication and characterization of solar cells. The partial purification of metallurgical silicon by extraction with aqua regia has been investigated in detail, and the resulting silicon was analyzed by the atomic absorption technique. The unidirectional solidification of aqua regia-extracted metallurgical silicon on graphite was used for the preparation of substrates, and the impurity distribution in the substrate was also determined. Large area (> 30 cm/sup 2/) solar cells have been prepared from aqua regia-extracted metallurgical silicon substrates by the thermal reduction of trichlorosilane containing appropriate dopants. Chemically deposited tin-dioxide films were used as antireflection coatings. Solar cells with AM1 efficiencies of about 8.5% have been obtained. Their spectral response, minority carrier diffusion length, and I/sub sc/-V/sub oc/ relation have been measured.

  9. Electrochemical characterisation of copper thin-film formation on polycrystalline platinum.

    PubMed

    Berkes, Balázs B; Henry, John B; Huang, Minghua; Bondarenko, Alexander S

    2012-09-17

    Electrochemically formed thin films are vital for a broad range of applications in virtually every field of modern science and technology. Understanding the film formation process could provide a means to aid the characterisation and control of film properties. Herein, we present a fundamental approach that combines two well-established analytical techniques (namely, electrochemical impedance spectroscopy and electrogravimetry) with a theoretical approach to provide physico-chemical information on the electrode/electrolyte interface during film formation. This approach allows the monitoring of local and overall surface kinetic parameters with time to enable an evaluation of the different modes of film formation. This monitoring is independent of surface area and surface concentrations of electroactive species and so may allow current computational methods to calculate these parameters and provide a deeper physical understanding of the electrodeposition of new bulk phases. The ability of this method to characterise 3D phase growth in situ in more detail than that obtained by conventional approaches is demonstrated through the study of a model system, namely, Cu bulk-phase deposition on a Pt electrode covered with a Cu atomic layer (Cu(ad)/Pt).

  10. Effect of deposition temperature on electron-beam evaporated polycrystalline silicon thin-film and crystallized by diode laser

    SciTech Connect

    Yun, J. Varalmov, S.; Huang, J.; Green, M. A.; Kim, K.

    2014-06-16

    The effects of the deposition temperature on the microstructure, crystallographic orientation, and electrical properties of a 10-μm thick evaporated Si thin-film deposited on glass and crystallized using a diode laser, are investigated. The crystallization of the Si thin-film is initiated at a deposition temperature between 450 and 550 °C, and the predominant (110) orientation in the normal direction is found. Pole figure maps confirm that all films have a fiber texture and that it becomes stronger with increasing deposition temperature. Diode laser crystallization is performed, resulting in the formation of lateral grains along the laser scan direction. The laser power required to form lateral grains is higher in case of films deposited below 450 °C for all scan speeds. Pole figure maps show 75% occupancies of the (110) orientation in the normal direction when the laser crystallized film is deposited above 550 °C. A higher density of grain boundaries is obtained when the laser crystallized film is deposited below 450 °C, which limits the solar cell performance by n = 2 recombination, and a performance degradation is expected due to severe shunting.

  11. In-situ investigation of thermal instabilities and solid state dewetting in polycrystalline platinum thin films via confocal laser microscopy

    SciTech Connect

    Jahangir, S.; Cheng, Xuan; Huang, H. H.; Nagarajan, V.; Ihlefeld, J.

    2014-10-28

    Solid state dewetting and the subsequent morphological changes for platinum thin films grown on zinc oxide (ZnO) buffered (001) silicon substrates (Pt/ZnO/SiO{sub 2}/(001)Si system) is investigated under vacuum conditions via a custom-designed confocal laser microscope coupled with a laser heating system. Live imaging of thin film dewetting under a range of heating and quenching vacuum ambients reveals events including hillock formation, hole formation, and hole growth that lead to formation of a network of Pt ligaments, break up of Pt ligaments to individual islands and subsequent Pt islands shape reformation, in chronological fashion. These findings are corroborated by ex-situ materials characterization and quantitative electron microscopy analysis. A secondary hole formation via blistering before film rupture is revealed to be the critical stage, after which a rapid dewetting catastrophe occurs. This process is instantaneous and cannot be captured by ex-situ methods. Finally, an intermetallic phase forms at 900 °C and alters the morphology of Pt islands, suggesting a practical limit to the thermal environments that may be used for these platinized silicon wafers in vacuum conditions.

  12. Composite Yb:YAG/SiC-prism thin disk laser.

    PubMed

    Newburgh, G A; Michael, A; Dubinskii, M

    2010-08-02

    We report the first demonstration of a Yb:YAG thin disk laser wherein the gain medium is intracavity face-cooled through bonding to an optical quality SiC prism. Due to the particular design of the composite bonded Yb:YAG/SiC-prism gain element, the laser beam impinges on all refractive index interfaces inside the laser cavity at Brewster's angles. The laser beam undergoes total internal reflection (TIR) at the bottom of the Yb(10%):YAG thin disk layer in a V-bounce cavity configuration. Through the use of TIR and Brewster's angles, no optical coatings, either anti-reflective (AR) or highly reflective (HR), are required inside the laser cavity. In this first demonstration, the 936.5-nm diode pumped laser performed with approximately 38% slope efficiency at 12 W of quasi-CW (Q-CW) output power at 1030 nm with a beam quality measured at M(2) = 1.5. This demonstration opens up a viable path toward novel thin disk laser designs with efficient double-sided room-temperature heatsinking via materials with the thermal conductivity of copper on both sides of the disk.

  13. Super-high density Si quantum dot thin film utilizing a gradient Si-rich oxide multilayer structure.

    PubMed

    Kuo, Kuang-Yang; Huang, Pin-Ruei; Lee, Po-Tsung

    2013-05-17

    A gradient Si-rich oxide multilayer (GSRO-ML) deposition structure is proposed to achieve super-high density Si quantum dot (QD) thin film formation while preserving QD size controllability for better photovoltaic properties. Our results indicate that the Si QD thin film using a GSRO-ML structure can efficiently increase the QD density and control the QD size. Its optical properties clearly promise the capability of effective bandgap engineering even though these QDs are closely formed. The Si QD thin film using a GSRO-ML structure obviously reveals better electro-optical properties than those using a [silicon dioxide/silicon-rich oxide] multilayer ([SiO2/SRO]-ML) structure owing to the better optical absorption and carrier transport properties. Therefore, we successfully demonstrate that our proposed GSRO-ML structure has great potential for application in solar cells integrating Si QD thin films.

  14. Cell adhesion to cathodic arc plasma deposited CrAlSiN thin films

    NASA Astrophysics Data System (ADS)

    Kim, Sun Kyu; Pham, Vuong-Hung; Kim, Chong-Hyun

    2012-07-01

    Osteoblast cell response (cell adhesion, actin cytoskeleton and focal contact adhesion as well as cell proliferation) to CrN, CrAlSiN and Ti thin films was evaluated in vitro. Cell adhesion and actin stress fibers organization depended on the film composition significantly. Immunofluorescent staining of vinculin in osteoblast cells showed good focal contact adhesion on the CrAlSiN and Ti thin films but not on the CrN thin films. Cell proliferation was significantly greater on the CrAlSiN thin films as well as on Ti thin films than on the CrN thin films.

  15. Role of surface-reaction layer in HBr/fluorocarbon-based plasma with nitrogen addition formed by high-aspect-ratio etching of polycrystalline silicon and SiO2 stacks

    NASA Astrophysics Data System (ADS)

    Iwase, Taku; Matsui, Miyako; Yokogawa, Kenetsu; Arase, Takao; Mori, Masahito

    2016-06-01

    The etching of polycrystalline silicon (poly-Si)/SiO2 stacks by using VHF plasma was studied for three-dimensional NAND fabrication. One critical goal is achieving both a vertical profile and high throughput for multiple-stack etching. While the conventional process consists of multiple steps for each stacked layer, in this study, HBr/fluorocarbon-based gas chemistry was investigated to achieve a single-step etching process to reduce process time. By analyzing the dependence on wafer temperature, we improved both the etching profile and rate at a low temperature. The etching mechanism is examined considering the composition of the surface reaction layer. X-ray photoelectron spectroscopy (XPS) analysis revealed that the adsorption of N-H and Br was enhanced at a low temperature, resulting in a reduced carbon-based-polymer thickness and enhanced Si etching. Finally, a vertical profile was obtained as a result of the formation of a thin and reactive surface-reaction layer at a low wafer temperature.

  16. Synergistic effects of water addition and step heating on the formation of solution-processed zinc tin oxide thin films: towards high-mobility polycrystalline transistors

    NASA Astrophysics Data System (ADS)

    Huang, Genmao; Duan, Lian; Zhao, Yunlong; Zhang, Yunge; Dong, Guifang; Zhang, Deqiang; Qiu, Yong

    2016-11-01

    Thin-film transistors (TFTs) with high mobility and good uniformity are attractive for next-generation flat panel displays. In this work, solution-processed polycrystalline zinc tin oxide (ZTO) thin film with well-ordered microstructure is prepared, thanks to the synergistic effect of water addition and step heating. The step heating treatment other than direct annealing induces crystallization, while adequate water added to precursor solution further facilitates alloying and densification process. The optimal polycrystalline ZTO film is free of hierarchical sublayers, and featured with an increased amount of ternary phases, as well as a decreased fraction of oxygen vacancies and hydroxides. TFT devices based on such an active layer exhibit a remarkable field-effect mobility of 52.5 cm2 V-1 s-1, a current on/off ratio of 2 × 105, a threshold voltage of 2.32 V, and a subthreshold swing of 0.36 V dec-1. Our work offers a facile method towards high-performance solution-processed polycrystalline metal oxide TFTs.

  17. Self-aligned metal double-gate junctionless p-channel low-temperature polycrystalline-germanium thin-film transistor with thin germanium film on glass substrate

    NASA Astrophysics Data System (ADS)

    Hara, Akito; Nishimura, Yuya; Ohsawa, Hiroki

    2017-03-01

    Low-temperature (LT) polycrystalline-germanium (poly-Ge) thin-film transistors (TFTs) are viable contenders for use in the backplanes of flat-panel displays and in systems-on-glass because of their superior electrical properties compared with silicon and oxide semiconductors. However, LT poly-Ge shows strong p-type characteristics. Therefore, it is not easy to reduce the leakage current using a single-gate structure such as a top-gate or bottom-gate structure. In this study, self-aligned planar metal double-gate p-channel junctionless LT poly-Ge TFTs are fabricated on a glass substrate using a 15-nm-thick solid-phase crystallized poly-Ge film and aluminum-induced lateral metallization source-drain regions (Al-LM-SD). A nominal field-effect mobility of 19 cm2 V-1 s-1 and an on/off ratio of 2 × 103 were obtained by optimizing the Al-LM-SD on a glass substrate through a simple, inexpensive LT process.

  18. Ion-Assisted Laser Deposition of Intermediate Layers for Yttrium BARIUM(2) COPPER(3) OXYGEN(7-DELTA) Thin Film Growth on Polycrystalline and Amorphous Substrates.

    NASA Astrophysics Data System (ADS)

    Reade, Ronald Paul

    The growth of YB_2Cu _3O_{7-delta} (YBCO) high-temperature superconductor thin films has largely been limited to deposition on single-crystal substrates to date. In order to expand the range of potential applications, growth on polycrystalline and amorphous substrates is desirable. In particular, the deposition of YBCO thin films with high critical current densities on polycrystalline metal alloys would allow the manufacture of superconducting tapes. However, it is shown that it is not possible to grow YBCO thin films directly on this type of substrate due to chemical and structural incompatibility. This work investigates the use of a yttria-stabilized zirconia (YSZ) intermediate layer to address this problem. An ion-assisted pulsed-laser deposition process is developed to provide control of orientation during the growth of the YSZ layers. The important properties of YBCO and YSZ are summarized and the status of research on thin film growth of these materials is reviewed. An overview of the pulsed-laser deposition (PLD) technique is presented. The use of ion -assisted deposition techniques to control thin film properties is discussed. Using an ion-assisted PLD process, the growth of (001) YSZ layers with controlled alignment of the in -plane crystal axes is achieved on polycrystalline metal and other polycrystalline and amorphous substrates. Studies of the important process parameters are presented. These layers are demonstrated to be appropriate for the subsequent deposition of c-axis YBCO thin films with alignment of the in-plane axes. A critical temperature of 92K and critical current densities (at 77K) of 6times 10^5 and 5times 10^4 A/cm ^2 without and with a 0.4T magnetic field, have been achieved. These critical current densities are higher than those demonstrated for competing technologies. The applicability of the developed technology is discussed. The control of film orientation using the ion-assisted PLD process is compared to the existing theory and

  19. A comparison of scattering and non-scattering anti-reflection designs for back contacted polycrystalline thin film silicon solar cells in superstrate configuration

    NASA Astrophysics Data System (ADS)

    Lockau, Daniel; Hammerschmidt, M.; Haschke, Jan; Blome, Mark; Ruske, F.; Schmidt, F.; Rech, B.

    2014-05-01

    A new generation of polycrystalline silicon thin film solar cells is currently being developed in laboratories, employing a combination of novel laser or electron beam based liquid phase crystallization (LPC) techniques and single side contacting systems. The lateral grain size of these polycrystalline cells is in the millimeter range at an absorber thickness of up to 10 μm. In this contribution we present a comparative simulation study of several 1D, 2D and 3D nano-optical designs for the substrate / illumination side interface to the several micrometer thick back contacted LPC silicon absorber material. The compared geometries comprise multilayer coatings, gratings with step and continuous profiles as well as combinations thereof. Using the transfer matrix method and a finite element method implementation to rigorously solve Maxwell's equations, we discuss anti-reflection and scattering properties of the different front interface designs in view of the angular distribution of incident light.

  20. Excitation dependent photoluminescence study of Si-rich a-SiNx:H thin films

    NASA Astrophysics Data System (ADS)

    Kumar Bommali, Ravi; Preet Singh, Sarab; Rai, Sanjay; Mishra, P.; Sekhar, B. R.; Vijaya Prakash, G.; Srivastava, P.

    2012-12-01

    We report photoluminescence (PL) investigations on Si-rich amorphous hydrogenated silicon nitride (a-SiNx:H) thin films of different compositions, using three different excitation lasers, viz., 325 nm, 410 nm, and 532 nm. The as-deposited films contain amorphous Si quantum dots (QDs) as evidenced in high resolution transmission electron microscopy images. The PL spectral shape is in general seen to change with the excitation used, thus emphasizing the presence of multiple luminescence centres in these films. It is found that all the spectra so obtained can be deconvoluted assuming Gaussian contributions from defects and quantum confinement effect. Further strength to this assignment is provided by low temperature (300 °C) hydrogen plasma annealing of these samples, wherein a preferential enhancement of the QD luminescence over defect luminescence is observed.

  1. Auger electron spectroscopy of super-doped Si:Mn thin films

    NASA Astrophysics Data System (ADS)

    Abe, S.; Nakasima, Y.; Okubo, S.; Nakayama, H.; Nishino, T.; Yanagi, H.; Ohta, H.; Iida, S.

    1999-04-01

    Thin films of Si heavily doped with Mn impurities at nonequilibrium doping levels have been successfully prepared by Laser-Ablation MBE. The electronic structure of Mn-doped Si thin films have been investigated by Auger Valence Electron Spectroscopy (AVES). The peak positions of Mn[3p,V,V] (V=3d) Auger spectra of Si:Mn thin films were located at the higher energy region than those of pure Mn and Mn 5Si 3 compound. For the Si:Mn thin film grown on SiO 2/Si(001) substrate, the new Auger peak was observed around 50 eV. The changes of the line shape were observed in Mn[L,M,M] (L=2s,2p; M=3s,3p,3d) Auger spectra of Si:Mn thin films compared with those of pure Mn and Mn 5Si 3 compounds. In the Mn[2s,M,V] (M=3s,3p,V=3d) spectra for Si:Mn thin films, the new peaks were appeared around 700 eV. These new peaks were considered to arise from the new split of the 3d electron states due to the formation of the Mn-Si bonds in Si:Mn thin films.

  2. In situ study of dislocation behavior in columnar Al thin film on Si substrate during thermal cycling

    SciTech Connect

    Allen, C. W.; Schroeder, H.; Hiller, J. M.

    1999-12-13

    In situ transmission electron microscopy (150 kV) has been employed to study the evolution of dislocation microstructure during relatively rapid thermal cycling of a 200 nm Al thin film on Si substrate. After a few thermal cycles between 150 and 500 C, nearly stable Al columnar grain structure is established with average grain less than a {micro}m. On rapid cooling (3--30+ C/s) from 500 C, dislocations first appear at a nominal temperature of 360--380 C, quickly multiplying and forming planar glide plane arrays on further cooling. From a large number of such experiments the authors have attempted to deduce the dislocation evolution during thermal cycling in these polycrystalline Al films and to account qualitatively for the results on a simple dislocation model.

  3. THz pulse generation using a contact grating device composed of TiO2/SiO2 thin films on LiNbO3 crystal

    NASA Astrophysics Data System (ADS)

    Yoshida, Fumiko; Nagashima, Keisuke; Tsubouchi, Masaaki; Maruyama, Momoko; Ochi, Yoshihiro

    2016-11-01

    We developed a new contact grating device for terahertz (THz) pulse generation by optical rectification. The device was made from polycrystalline rutile TiO2 thin film in the grating region and an amorphous SiO2 layer deposited on a Mg-doped LiNbO3 crystal. Our calculations indicated that the TiO2 grating on the SiO2 layer would yield an increase in diffraction efficiency of up to 0.69. The prepared TiO2 thin film had a sufficient laser induced damage threshold (140 GW/cm2) to enable effective THz pulse generation. Using a prototype device, we demonstrated THz pulse generation and investigated the phase-matching conditions experimentally.

  4. Electronic transport in highly conducting Si-doped ZnO thin films prepared by pulsed laser deposition

    SciTech Connect

    Kuznetsov, Vladimir L.; Vai, Alex T.; Edwards, Peter P.; Al-Mamouri, Malek; Stuart Abell, J.; Pepper, Michael

    2015-12-07

    Highly conducting (ρ = 3.9 × 10{sup −4} Ωcm) and transparent (83%) polycrystalline Si-doped ZnO (SiZO) thin films have been deposited onto borosilicate glass substrates by pulsed laser deposition from (ZnO){sub 1−x}(SiO{sub 2}){sub x} (0 ≤ x ≤ 0.05) ceramic targets prepared using a sol-gel technique. Along with their structural, chemical, and optical properties, the electronic transport within these SiZO samples has been investigated as a function of silicon doping level and temperature. Measurements made between 80 and 350 K reveal an almost temperature-independent carrier concentration consistent with degenerate metallic conduction in all of these samples. The temperature-dependent Hall mobility has been modeled by considering the varying contribution of grain boundary and electron-phonon scattering in samples with different nominal silicon concentrations.

  5. The effects of layering in ferroelectric Si-doped HfO2 thin films

    NASA Astrophysics Data System (ADS)

    Lomenzo, Patrick D.; Takmeel, Qanit; Zhou, Chuanzhen; Liu, Yang; Fancher, Chris M.; Jones, Jacob L.; Moghaddam, Saeed; Nishida, Toshikazu

    2014-08-01

    Atomic layer deposited Si-doped HfO2 thin films approximately 10 nm thick are deposited with various Si-dopant concentrations and distributions. The ferroelectric behavior of the HfO2 thin films are shown to be dependent on both the Si mol. % and the distribution of Si-dopants. Metal-ferroelectric-insulator-semiconductor capacitors are shown to exhibit a tunable remanent polarization through the adjustment of the Si-dopant distribution at a constant Si concentration. Inhomogeneous layering of Si-dopants within the thin films effectively lowers the remanent polarization. A pinched hysteresis loop is observed for higher Si-dopant concentrations and found to be dependent on the Si layering distribution.

  6. Well-aligned polycrystalline lanthanum silicate oxyapatite grown by reactive diffusion between solid La{sub 2}SiO{sub 5} and gases [SiO+1/2O{sub 2}

    SciTech Connect

    Fukuda, Koichiro; Hasegawa, Ryo; Kitagawa, Takuya; Nakamori, Hiroshi; Asaka, Toru; Berghout, Abid; Béchade, Emilie; Masson, Olivier; Jouin, Jenny; Thomas, Philippe

    2016-03-15

    The c-axis-oriented polycrystalline lanthanum silicate oxyapatite, La{sub 9.48}(Si{sub 5.89}□{sub 0.11})O{sub 26} (□ denotes a vacancy in the Si site), was successfully prepared by the reactive diffusion between randomly grain-oriented La{sub 2}SiO{sub 5} polycrystal and [SiO+1/2O{sub 2}] gases at 1873 K in Ar atmosphere. The polycrystal was characterized using optical microscopy, scanning electron microscopy equipped with energy dispersive X-ray spectroscopy, micro-Raman spectroscopy, X-ray diffractometry, and impedance spectroscopy. The crystal structure (space group P6{sub 3}/m) showed the deficiency of Si site at ca. 1.9%. The bulk oxide-ion conductivity along the grain-alignment direction steadily increased from 9.2 × 10{sup −3} to 1.17 × 10{sup −2} S/cm with increasing temperature from 923 to 1073 K. The activation energy of conduction was 0.23(2) eV. - Graphical abstract: We have successfully prepared the highly c-axis-oriented polycrystalline La{sub 9.48}(Si{sub 5.89}□{sub 0.11})O{sub 26} by the reactive diffusion between randomly grain-oriented La{sub 2}SiO{sub 5} polycrystal and [SiO + 1/2O{sub 2}] gases at 1873 K in Ar atmosphere. The crystal structure (space group P6{sub 3}/m) showed the deficiency of Si site of ca. 1.9%. - Highlights: • The c-axis-oriented polycrystalline La{sub 9.48}(Si{sub 5.89}□{sub 0.11})O{sub 26} is successfully prepared. • Crystal structure of La{sub 9.48}(Si{sub 5.89}□{sub 0.11})O{sub 26} is determined by single-crystal XRD. • The polycrystal shows relatively high oxide ion conductivity along the common c-axis. • Reactive diffusion is successfully used for the preparation of grain-aligned ceramics.

  7. n +-Microcrystalline-Silicon Tunnel Layer in Tandem Si-Based Thin Film Solar Cells

    NASA Astrophysics Data System (ADS)

    Lee, Ching-Ting; Lee, Hsin-Ying; Chen, Kuan-Hao

    2016-10-01

    In this study, the p-SiC/ i-Si/ n-Si cell and the p-SiC/ i-SiGe/ n-Si cell deposited using plasma-enhanced chemical vapor deposition were cascaded for forming the tandem Si-based thin film solar cells to absorb the wide solar spectrum. To further improve the performances of the tandem Si-based thin film solar cells, a 5-nm-thick n +-microcrystalline-Si ( n +-μc-Si) tunnel layer deposited using the laser-assisted plasma-enhanced chemical vapor deposition was inserted between the p-SiC/ i-Si/ n-Si cell and the p-SiC/ i-SiGe/ n-Si cell. Since both the plasma and the CO2 laser were simultaneously utilized to efficiently decompose the reactant and doping gases, the carrier concentration and the carrier mobility of the n +-μc-Si tunnel layer were significantly improved. The ohmic contact formed between the p-SiC layer and the n +-μc-Si tunnel layer with low resistance was beneficial to the generated current transportation and the carrier recombination rate. Therefore, the conversion efficiency of the tandem solar cells was promoted from 8.57% and 8.82% to 9.91% compared to that without tunnel layer and with 5-nm-thick n +-amorphous-Si tunnel layer.

  8. Bioactivity of polycrystalline silicon layers.

    PubMed

    Pramatarova, Lilyana; Pecheva, Emilia; Montgomery, Paul; Dimova-Malinovska, Doriana; Petrov, Todor; Toth, Attila L; Dimitrova, Magdalena

    2008-02-01

    After oxygen, silicon is the second most abundant element in the environment and is present as an impurity in most materials. The widespread occurrence of siliceous biominerals as structural elements in lower plants and animals suggests that Si plays a role in the production and maintenance of connective tissue in higher organisms. It has been shown that the presence of Si is necessary in bones, cartilage and in the formation of connective tissue, as well as in some important metabolic processes. In this work, polycrystalline silicon layers are tested in terms of bioactivity, i.e., their ability to induce hydroxyapatite formation from simulated body fluid. Hydroxyapatite is a biologically compatible material with chemical similarity to the inorganic part of bones and teeth. Polycrystalline silicon layers are obtained by aluminum induced crystallization of Al and amorphous Si thin films deposited sequentially on glass substrates by radio-frequency magnetron sputtering and subsequently annealed in different atmospheres. The hydroxyapatite formation is induced by applying a method of laser-liquid-solid interaction. The method consists of irradiating the samples with laser light while immersed in a solution that is supersaturated with respect to Ca and P. As a result, heterogeneous porous sponge-like carbonate-containing hydroxyapatite is grown on the polysilicon surfaces. Crystals that are spherical in shape, containing Ca, P and O, Na, Cl, Mg, Al, Si and S, as well as well-faceted NaCl crystals are embedded in the hydroxyapatite layer. Enhancement of the hydroxyapatite growth and increased crystallinity is observed due to the applied laser-liquid-solid interaction.

  9. Impact of solid-phase crystallization of amorphous silicon on the chemical structure of the buried Si/ZnO thin film solar cell interface

    SciTech Connect

    Bar, M.; Wimmer, M.; Wilks, R. G.; Roczen, M.; Gerlach, D.; Ruske, F.; Lips, K.; Rech, B.; Weinhardt, L.; Blum, M.; Pookpanratana, S.; Krause, S.; Zhang, Y.; Heske, C.; Yang, W.; Denlinger, J. D.

    2010-04-30

    The chemical interface structure between phosphorus-doped hydrogenated amorphous silicon and aluminum-doped zinc oxide thin films is investigated with soft x-ray emission spectroscopy (XES) before and after solid-phase crystallization (SPC) at 600C. In addition to the expected SPC-induced phase transition from amorphous to polycrystalline silicon, our XES data indicates a pronounced chemical interaction at the buried Si/ZnO interface. In particular, we find an SPC-enhanced formation of Si-O bonds and the accumulation of Zn in close proximity to the interface. For an assumed closed and homogeneous SiO2 interlayer, an effective thickness of (5+2)nm after SPC could be estimated.

  10. Bottom-gate poly-Si thin-film transistors by nickel silicide seed-induced lateral crystallization with self-aligned lightly doped layer

    NASA Astrophysics Data System (ADS)

    Lee, Sol Kyu; Seok, Ki Hwan; Chae, Hee Jae; Lee, Yong Hee; Han, Ji Su; Jo, Hyeon Ah; Joo, Seung Ki

    2017-03-01

    We report a novel method to reduce source and drain (S/D) resistances, and to form a lightly doped layer (LDL) of bottom-gate polycrystalline silicon (poly-Si) thin-film transistors (TFTs). For application in driving TFTs, which operate under high drain voltage condition, poly-Si TFTs are needed in order to attain reliability against hot-carriers as well as high field-effect mobility (μFE). With an additional doping on the p+ Si layer, sheet resistance on S/D was reduced by 37.5% and an LDL was introduced between the channel and drain. These results contributed to not only a lower leakage current and gate-induced drain leakage, but also high immunity of kink-effect and hot-carrier stress. Furthermore, the measured electrical characteristics exhibited a steep subthreshold slope of 190 mV/dec and high μFE of 263 cm2/Vs.

  11. Polycrystalline silicon availability for photovoltaic and semiconductor industries

    NASA Technical Reports Server (NTRS)

    Ferber, R. R.; Costogue, E. N.; Pellin, R.

    1982-01-01

    Markets, applications, and production techniques for Siemens process-produced polycrystalline silicon are surveyed. It is noted that as of 1982 a total of six Si materials suppliers were servicing a worldwide total of over 1000 manufacturers of Si-based devices. Besides solar cells, the Si wafers are employed for thyristors, rectifiers, bipolar power transistors, and discrete components for control systems. An estimated 3890 metric tons of semiconductor-grade polycrystalline Si will be used in 1982, and 6200 metric tons by 1985. Although the amount is expected to nearly triple between 1982-89, research is being carried out on the formation of thin films and ribbons for solar cells, thereby eliminating the waste produced in slicing Czolchralski-grown crystals. The free-world Si production in 1982 is estimated to be 3050 metric tons. Various new technologies for the formation of polycrystalline Si at lower costs and with less waste are considered. New entries into the industrial Si formation field are projected to produce a 2000 metric ton excess by 1988.

  12. Measured temperature and pressure dependence of Vp and Vs in compacted, polycrystalline sI methane and sII methane-ethane hydrate

    USGS Publications Warehouse

    Helgerud, M.B.; Waite, W.F.; Kirby, S.H.; Nur, A.

    2003-01-01

    We report on compressional- and shear-wave-speed measurements made on compacted polycrystalline sI methane and sII methane-ethane hydrate. The gas hydrate samples are synthesized directly in the measurement apparatus by warming granulated ice to 17??C in the presence of a clathrate-forming gas at high pressure (methane for sI, 90.2% methane, 9.8% ethane for sII). Porosity is eliminated after hydrate synthesis by compacting the sample in the synthesis pressure vessel between a hydraulic ram and a fixed end-plug, both containing shear-wave transducers. Wave-speed measurements are made between -20 and 15??C and 0 to 105 MPa applied piston pressure.

  13. Studies on VOx thin films deposited over Si3N4 coated Si substrates

    NASA Astrophysics Data System (ADS)

    Raj, P. Deepak; Gupta, Sudha; Sridharan, M.

    2015-06-01

    Vanadium oxide (VOx) thin films were deposited on to the silicon nitride (Si3N4) coated silicon (Si) substrate using reactive direct current magnetron sputtering at different substrate temperatures (Ts). The deposited films were characterized for their structural, morphological, optical and electrical properties. The average grain size of the deposited films was in the range of 95 to 178 nm and the strain varied from 0.071 to 0.054 %. The optical bandgap values of the films were evaluated using UV-Vis spectroscopy and lies in the range of 2.46 to 3.88 eV. The temperature coefficient of resistance (TCR) for the film deposited at 125 °C was -1.23%/°C with the sheet resistivity of 2.7 Ω.cm.

  14. Electrical properties of SrTiO3 thin films on Si deposited by magnetron sputtering at low temperature

    NASA Astrophysics Data System (ADS)

    Wang, Zhongchun; Kugler, Veronika; Helmersson, Ulf; Konofaos, N.; Evangelou, E. K.; Nakao, Setsuo; Jin, Ping

    2001-09-01

    Deposition of SrTiO3 (STO) thin films by radio-frequency magnetron sputtering in an ultrahigh vacuum system at a low substrate temperature (˜200 °C) was performed in order to produce high-quality STO/p-Si (100) interfaces and STO insulator layers with dielectric constants of high magnitude. The STO films were identified as polycrystalline by x-ray diffraction, and were approximated with a layered structure according to the best fitting results of raw data from both Rutherford backscattering spectroscopy and variable angle spectroscopic ellipsometry. Room-temperature current-voltage and capacitance-voltage (C-V) measurements on Al/STO/p-Si diodes clearly revealed metal-insulator-semiconductor behavior, and the STO/p-Si interface state densities were of the order of 1011eV-1 cm-2. The dielectric constant of the STO film was 65, and the dielectric loss factor varied between 0.05 and 0.55 for a frequency range of 1 kHz-10 MHz. For a 387 nm thick STO film, the dielectric breakdown field was 0.31 MV cm-1, and the charge storage capacity was 2.1 μC cm-2. These results indicate that STO films are suitable for applications as insulator layers in dynamic random access memories or as cladding layers in electroluminescent devices.

  15. Atomic-resolution characterization of the effects of CdCl{sub 2} treatment on poly-crystalline CdTe thin films

    SciTech Connect

    Paulauskas, T. Buurma, C.; Colegrove, E.; Guo, Z.; Sivananthan, S.; Klie, R. F.

    2014-08-18

    Poly-crystalline CdTe thin films on glass are used in commercial solar-cell superstrate devices. It is well known that post-deposition annealing of the CdTe thin films in a CdCl{sub 2} environment significantly increases the device performance, but a fundamental understanding of the effects of such annealing has not been achieved. In this Letter, we report a change in the stoichiometry across twin boundaries in CdTe and propose that native point defects alone cannot account for this variation. Upon annealing in CdCl{sub 2}, we find that the stoichiometry is restored. Our experimental measurements using atomic-resolution high-angle annular dark field imaging, electron energy-loss spectroscopy, and energy dispersive X-ray spectroscopy in a scanning transmission electron microscope are supported by first-principles density functional theory calculations.

  16. Quantitative analysis of the magnetic domain structure in polycrystalline La(0.7)Sr(0.3)MnO3 thin films by magnetic force microscopy.

    PubMed

    Li, Zhenghua; Wei, Fulin; Yoshimura, Satoru; Li, Guoqing; Asano, Hidefumi; Saito, Hitoshi

    2013-01-14

    The nanoscale magnetic domain structure of the polycrystalline La(0.7)Sr(0.3)MnO(3) granular thin films was imaged with a developed magnetic force microscopy technique by simultaneously detecting both the perpendicular and in-plane components of magnetic field gradients during the same scan of the tip oscillation. The characteristics of both the perpendicular and in-plane magnetic field gradient at the grain edges or the nonmagnetic grain boundary phase for LSMO films were demonstrated and can be used to evaluate the magnetic domain structure and magnetic isolation between neighboring grains. A two dimensional signal transformation algorithm to reconstruct the in-plane magnetization distribution of the polycrystalline LSMO thin films from the measured raw MFM images with the aid of the deconvolution technique was presented. The comparison between the experimental and simulated MFM images indicates that the magnetic grains or clusters are in the single domain (SD) or multi-domain (MD) state with the magnetic moments parallel or anti-parallel to the effective magnetic field of each grain, possibly due to the need for minimizing the total energy. The quantitative interpretation of the magnetic domain structure indicates that the large magnetoresistance in the studied LSMO films is mainly due to tunnel effect and scattering of conducted electrons at the nonmagnetic grain boundary phase related to the different configurations of magnetic domain states between neighboring grains.

  17. Large-Scale PV Module Manufacturing Using Ultra-Thin Polycrystalline Silicon Solar Cells: Final Subcontract Report, 1 April 2002--28 February 2006

    SciTech Connect

    Wohlgemuth, J.; Narayanan, M.

    2006-07-01

    The major objectives of this program were to continue advances of BP Solar polycrystalline silicon manufacturing technology. The Program included work in the following areas. (1) Efforts in the casting area to increase ingot size, improve ingot material quality, and improve handling of silicon feedstock as it is loaded into the casting stations. (2) Developing wire saws to slice 100-..mu..m-thick silicon wafers on 290-..mu..m-centers. (3) Developing equipment for demounting and subsequent handling of very thin silicon wafers. (4) Developing cell processes using 100-..mu..m-thick silicon wafers that produce encapsulated cells with efficiencies of at least 15.4% at an overall yield exceeding 95%. (5) Expanding existing in-line manufacturing data reporting systems to provide active process control. (6) Establishing a 50-MW (annual nominal capacity) green-field Mega-plant factory model template based on this new thin polycrystalline silicon technology. (7) Facilitating an increase in the silicon feedstock industry's production capacity for lower-cost solar-grade silicon feedstock..

  18. [Spectral analyzing effects of atmosphere states on the structure and characteristics of CdTe polycrystalline thin films made by close-spaced sublimation].

    PubMed

    Zheng, Hua-jing; Zheng, Jia-gui; Feng, Liang-huan; Zhang, Jing-quan; Xie, Er-qing

    2005-07-01

    The structure and characteristics of CdTe thin films are dependent on the working atmosphere states in close-spaced sublimation. In the present paper, CdTe polycrystalline thin films were deposited by CSS in mixture atmosphere of argon and oxygen. The physical mechanism of CSS was analyzed, and the temperature distribution in CSS system was measured. The dependence of preliminary nucleus creation on the atmosphere states (involving component and pressure) was studied. Transparencies were measured and optic energy gaps were calculated. The results show that: (1) The CdTe films deposited in different atmospheres are cubic structure. With increasing oxygen concentration, a increases and reaches the maximum at 6% oxygen concentration, then reduces, and increases again after passing the point at 12% oxygen concentration. Among them, the sample depositing at 9% oxygen concentration is the best. The optic energy gaps are 1.50-1.51 eV for all CdTe films. (2) The samples depositing at different pressures at 9% oxygen concentration are all cubical structure of CdTe, and the diffraction peaks of CdS and SnO2:F still appear. With the gas pressure increasing, the crystal size of CdTe minishes, the transparency of the thin film goes down, and the absorption side shifts to the short-wave direction. (3) The polycrystalline thin films with high quality deposit in 4 minutes under the depositing condition that the substrate temperature is 550 degrees C, and source temperature is 620 degrees C at 9% oxygen concentration.

  19. Superlattice Multinanolayered Thin Films of SiO2/SiO2 + Ge for Thermoelectric Device Applications

    DTIC Science & Technology

    2013-04-05

    the cross-plane ther- mal conductivity values since the more high-energy beam might have destroyed the multinanolayered superlattice thin film...structures. Tasciuc et al. (2000) used the 3v technique to measure the cross-plane ther- mal conductivity of the symmetrically strained Si/Ge superlattices...the two elements (Tritt and Subramanian, 2006). In our superlattice sys- tem, we have prepared the SiO2/SiO2 + Ge amor - phous multilayer films. Our

  20. Enhanced electrochemical performance of Si-Cu-Ti thin films by surface covered with Cu3Si nanowires

    NASA Astrophysics Data System (ADS)

    Xu, Kaiqi; He, Yu; Ben, Liubin; Li, Hong; Huang, Xuejie

    2015-05-01

    Si-Cu-Ti thin films with Cu3Si nanowires on the surface and voids in the Cu layer are fabricated for the first time by magnetron sputtering combined with atomic layer deposition (ALD) of alumina. The formation of the surface Cu3Si nanowires is strongly dependent on the thickness of the coated alumina and cooling rate of the thin films during annealing. The maximum coverage of the surface Cu3Si nanowires is obtained with an alumina thickness of 2 nm and a cooling rate of 1 °C min-1. The electrode based on this thin film shows an excellent capacity retention of more than 900 mAh g-1 and a high columbic efficiency of more than 99% after 100 cycles. The improvement of the electrochemical performance of Si-Cu-Ti thin film electrode is attributed to the surface Cu3Si nanowires which reduce the polarization and inhomogeneous lithiation by formation of a surface conductive network, in addition to the alleviation of volume expansion of Si by voids in the Cu layer during cycling.

  1. Potential-induced degradation of thin-film Si photovoltaic modules

    NASA Astrophysics Data System (ADS)

    Masuda, Atsushi; Hara, Yukiko

    2017-04-01

    Potential-induced degradation (PID) of thin-film Si photovoltaic (PV) modules was investigated. The characteristics of PID phenomena of thin-film Si PV modules are markedly different from those of crystalline Si PV modules. Not only performance loss but also linear-shape and spot-shape delamination was observed after negative voltage application. Recovery from PID was also observed after positive voltage application. However, rapid progression of PID was found after the second negative voltage application after recovery from the initial PID. The root cause of PID of thin-film Si PV modules is thought to be the delamination between a transparent conductive oxide film and a glass substrate. Such degradation accompanied by delamination was also observed in thin-film Si PV modules exposed outside for about 5 years.

  2. White light emission and optical gains from a Si nanocrystal thin film

    NASA Astrophysics Data System (ADS)

    Wang, Dong-Chen; Hao, Hong-Chen; Chen, Jia-Rong; Zhang, Chi; Zhou, Jing; Sun, Jian; Lu, Ming

    2015-11-01

    We report a Si nanocrystal thin film consisting of free-standing Si nanocrystals, which can emit white light and show positive optical gains for its red, green and blue (RGB) components under ultraviolet excitation. Si nanocrystals with ϕ = 2.31 ± 0.35 nm were prepared by chemical etching of Si powder, followed by filtering. After being mixed with SiO2 sol-gel and thermally annealed, a broadband photoluminescence (PL) from the thin film was observed. The RGB ratio of the PL can be tuned by changing the annealing temperature or atmosphere, which is 1.00/3.26/4.59 for the pure white light emission. The origins of the PL components could be due to differences in oxygen-passivation degree for Si nanocrystals. The results may find applications in white-light Si lasing and Si lighting.

  3. White light emission and optical gains from a Si nanocrystal thin film.

    PubMed

    Wang, Dong-Chen; Hao, Hong-Chen; Chen, Jia-Rong; Zhang, Chi; Zhou, Jing; Sun, Jian; Lu, Ming

    2015-11-27

    We report a Si nanocrystal thin film consisting of free-standing Si nanocrystals, which can emit white light and show positive optical gains for its red, green and blue (RGB) components under ultraviolet excitation. Si nanocrystals with ϕ = 2.31 ± 0.35 nm were prepared by chemical etching of Si powder, followed by filtering. After being mixed with SiO2 sol-gel and thermally annealed, a broadband photoluminescence (PL) from the thin film was observed. The RGB ratio of the PL can be tuned by changing the annealing temperature or atmosphere, which is 1.00/3.26/4.59 for the pure white light emission. The origins of the PL components could be due to differences in oxygen-passivation degree for Si nanocrystals. The results may find applications in white-light Si lasing and Si lighting.

  4. Defect engineering by ultrasound treatment in polycrystalline silicon

    SciTech Connect

    Ostapenko, S.; Jastrzebski, L.

    1995-08-01

    By applying ultrasound treatment (UST) to bulk and thin film polycrystalline Si (poly-Si) we have found a dramatic improvement of recombination and transport properties. The increasing of minority carrier lifetime by as much as one order of magnitude was found in short diffusion length regions, while exhibiting a strong dispersion for entire solar-grade poly-Si wafer. Relevant mechanisms are attributed to ultrasound processing on crystallographic defects, as well as UST stimulated dissociation of Fe-B pairs followed by Fe{sub i} gettering. A spectacular improvement of hydrogenation efficiency in poly-Si thin-films on glass substrate is demonstrated by resistivity study and confirmed using spatially resolved photoluminescence and nanoscale contact potential difference mapping. By applying UST to commercial solar cells we found the increasing of cell efficiency at low light excitation.

  5. Synthesis of TiN/a-Si3N4 thin film by using a Mather type dense plasma focus system

    NASA Astrophysics Data System (ADS)

    Hussain, T.; R., Ahmad; Khalid, N.; A. Umar, Z.; Hussnain, A.

    2013-05-01

    A 2.3 kJ Mather type pulsed plasma focus device was used for the synthesis of a TiN/a-Si3N4 thin film at room temperature. The film was characterized using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and atomic force microscopy (AFM). The XRD pattern confirms the growth of polycrystalline TiN thin film. The XPS results indicate that the synthesized film is non-stoichiometric and contains titanium nitride, silicon nitride, and a phase of silicon oxy-nitride. The SEM and AFM results reveal that the surface of the synthesized film is quite smooth with 0.59 nm roughness (root-mean-square).

  6. Plasmonic light trapping in thin-film Si solar cells

    NASA Astrophysics Data System (ADS)

    Spinelli, P.; Ferry, V. E.; van de Groep, J.; van Lare, M.; Verschuuren, M. A.; Schropp, R. E. I.; Atwater, H. A.; Polman, A.

    2012-02-01

    Plasmonic nanostructures have been recently investigated as a possible way to improve absorption of light in solar cells. The strong interaction of small metal nanostructures with light allows control over the propagation of light at the nanoscale and thus the design of ultrathin solar cells in which light is trapped in the active layer and efficiently absorbed. In this paper we review some of our recent work in the field of plasmonics for improved solar cells. We have investigated two possible ways of integrating metal nanoparticles in a solar cell. First, a layer of Ag nanoparticles that improves the standard antireflection coating used for crystalline and amorphous silicon solar cells has been designed and fabricated. Second, regular and random arrays of metal nanostructures have been designed to couple light in waveguide modes of thin semiconductor layers. Using a large-scale, relative inexpensive nano-imprint technique, we have designed a back-contact light trapping surface for a-Si:H solar cells which show enhanced efficiency over standard randomly textured cells.

  7. Terahertz conductivity of MnSi thin films

    NASA Astrophysics Data System (ADS)

    Dodge, J.; Mohtashemi, Laleh; Farahani, Amir; Karhu, Eric; Monchesky, Theodore

    2013-03-01

    We present measurements of the low-frequency optical conductivity of MnSi thin films, using time-domain terahertz spectroscopy. At low temperatures and low frequencies, we extract the DC resistivity, scattering life time and plasma frequency from a Drude fit. We obtain a value of ωp ~= 1 . 0 eV, which can be used to estimate the renormalization coefficient through comparison with band theory. At higher temperatures, deviations from Drude behavior are observed, suggesting a loss of quasi-particle coherence. In the region of low temperatures and high frequencies, we see evidence for a crossover to the anomalous power law dependence observed by Mena et al. As the temperature increases, the anomalous frequency dependence becomes more pronounced, and the plasma frequency inferred from a Drude fit decreases dramatically. Above T ~ 50 K, σ2 (ω) develops a negative slope that is inconsistent with both a Drude model and the anomalous power law observed earlier, indicating a sharp pseudogap in the conductivity spectrum.

  8. Sub-kT/q Subthreshold-Slope Using Negative Capacitance in Low-Temperature Polycrystalline-Silicon Thin-Film Transistor

    NASA Astrophysics Data System (ADS)

    Park, Jae Hyo; Jang, Gil Su; Kim, Hyung Yoon; Seok, Ki Hwan; Chae, Hee Jae; Lee, Sol Kyu; Joo, Seung Ki

    2016-04-01

    Realizing a low-temperature polycrystalline-silicon (LTPS) thin-film transistor (TFT) with sub-kT/q subthreshold slope (SS) is significantly important to the development of next generation active-matrix organic-light emitting diode displays. This is the first time a sub-kT/q SS (31.44 mV/dec) incorporated with a LTPS-TFT with polycrystalline-Pb(Zr,Ti)O3 (PZT)/ZrTiO4 (ZTO) gate dielectrics has been demonstrated. The sub-kT/q SS was observed in the weak inversion region at -0.5 V showing ultra-low operating voltage with the highest mobility (250.5 cm2/Vsec) reported so far. In addition, the reliability of DC negative bias stress, hot carrier stress and self-heating stress in LTPS-TFT with negative capacitance was investigated for the first time. It was found that the self-heating stress showed accelerated SS degradation due to the PZT Curie temperature.

  9. Sub-kT/q Subthreshold-Slope Using Negative Capacitance in Low-Temperature Polycrystalline-Silicon Thin-Film Transistor

    PubMed Central

    Park, Jae Hyo; Jang, Gil Su; Kim, Hyung Yoon; Seok, Ki Hwan; Chae, Hee Jae; Lee, Sol Kyu; Joo, Seung Ki

    2016-01-01

    Realizing a low-temperature polycrystalline-silicon (LTPS) thin-film transistor (TFT) with sub-kT/q subthreshold slope (SS) is significantly important to the development of next generation active-matrix organic-light emitting diode displays. This is the first time a sub-kT/q SS (31.44 mV/dec) incorporated with a LTPS-TFT with polycrystalline-Pb(Zr,Ti)O3 (PZT)/ZrTiO4 (ZTO) gate dielectrics has been demonstrated. The sub-kT/q SS was observed in the weak inversion region at −0.5 V showing ultra-low operating voltage with the highest mobility (250.5 cm2/Vsec) reported so far. In addition, the reliability of DC negative bias stress, hot carrier stress and self-heating stress in LTPS-TFT with negative capacitance was investigated for the first time. It was found that the self-heating stress showed accelerated SS degradation due to the PZT Curie temperature. PMID:27098115

  10. Sub-kT/q Subthreshold-Slope Using Negative Capacitance in Low-Temperature Polycrystalline-Silicon Thin-Film Transistor.

    PubMed

    Park, Jae Hyo; Jang, Gil Su; Kim, Hyung Yoon; Seok, Ki Hwan; Chae, Hee Jae; Lee, Sol Kyu; Joo, Seung Ki

    2016-04-21

    Realizing a low-temperature polycrystalline-silicon (LTPS) thin-film transistor (TFT) with sub-kT/q subthreshold slope (SS) is significantly important to the development of next generation active-matrix organic-light emitting diode displays. This is the first time a sub-kT/q SS (31.44 mV/dec) incorporated with a LTPS-TFT with polycrystalline-Pb(Zr,Ti)O3 (PZT)/ZrTiO4 (ZTO) gate dielectrics has been demonstrated. The sub-kT/q SS was observed in the weak inversion region at -0.5 V showing ultra-low operating voltage with the highest mobility (250.5 cm(2)/Vsec) reported so far. In addition, the reliability of DC negative bias stress, hot carrier stress and self-heating stress in LTPS-TFT with negative capacitance was investigated for the first time. It was found that the self-heating stress showed accelerated SS degradation due to the PZT Curie temperature.

  11. Absorption enhancement in thin film a-Si solar cells with double-sided SiO2 particle layers

    NASA Astrophysics Data System (ADS)

    Chen, Le; Wang, Qing-Kang; Shen, Xiang-Qian; Chen, Wen; Huang, Kun; Liu, Dai-Ming

    2015-10-01

    Light absorption enhancement is very important for improving the power conversion efficiency of a thin film a-Si solar cell. In this paper, a thin-film a-Si solar cell model with double-sided SiO2 particle layers is designed, and then the underlying mechanism of absorption enhancement is investigated by finite difference time domain (FDTD) simulation; finally the feasible experimental scheme for preparing the SiO2 particle layer is discussed. It is found that the top and bottom SiO2 particle layers play an important role in anti-reflection and light trapping, respectively. The light absorption of the cell with double-sided SiO2 layers greatly increases in a wavelength range of 300 nm-800 nm, and the ultimate efficiency increases more than 22% compared with that of the flat device. The cell model with double-sided SiO2 particle layers reported here can be used in varieties of thin film solar cells to further improve their performances. Project supported by the National High-Tech Research and Development Program of China (Grant No. 2011AA050518), the University Research Program of Guangxi Education Department, China (Grant No. LX2014288), and the Natural Science Foundation of Guangxi Zhuang Autonomous Region, China (Grant No. 2013GXNSBA019014).

  12. Low-temperature MOCVD growth of oriented PbZr{sub x}Ti{sub 1-x}O{sub 3} thin films on Si substrates.

    SciTech Connect

    Chen, N.

    1998-05-08

    Polycrystalline Pb(Zr{sub 0.6}Ti{sub 0.4})O{sub 3} (PZT) thin films, 3000-6000 {angstrom} thick, have been grown by metal-organic chemical vapor deposition (MOCVD) on (111)Pt/Ti/SiO{sub 2}/Si substrates at temperatures as low as 450-525 C. Random and (111)-oriented, or occasionally (100)-oriented, PZT films can be deposited directly on (111)Pt/Ti/SiO{sub 2}/Si. In addition, highly (100)-oriented films can be deposited consistently by using 150-250 {angstrom} thick (100)-oriented PbTiO{sub 3} (PT) or TiO{sub 2} as a template. Films were characterized by X-ray diffraction, electron microscopy, and electrical measurements. The as-grown (100)-oriented films on (111)Pt/TiSiO{sub 2}/Si substrates exhibited dielectric constants ({var_epsilon}{sub r}) of up to 600, remnant polarization (P{sub r}) of 40 {micro}C/cm{sup 2}, coercive field of 55 kV/cm, and breakdown field of 2-6 x 10{sub 7} V/m.

  13. Evaluation on residual stress in Bi3.15(Eu0.7Nd0.15)Ti3O12 polycrystalline ferroelectric thin film by using the orientation average method

    NASA Astrophysics Data System (ADS)

    Wei, Y.; Cheng, H. B.; Wang, X. Y.; Zheng, X. J.

    2012-12-01

    We propose an orientation average method to evaluate residual stresses in polycrystalline thin films. Bi3.15(Eu0.7Nd0.15)Ti3O12 was used to verify our approach, with films prepared by metal organic decomposition at various annealing temperatures. The mechanical properties and microstructure were characterized by nanoindentation and X-ray diffraction. The thin film annealed at 600 °C has the largest residual compressive stress of 771 MPa among all thin films. The residual stresses are evaluated by the proposed method and traditional sin2ψ method, and the maximum distinction is less than 6.43%, demonstrating that the proposed method is reliable and convenient to evaluate residual stress in polycrystalline thin films.

  14. Low temperature production of large-grain polycrystalline semiconductors

    DOEpatents

    Naseem, Hameed A.; Albarghouti, Marwan

    2007-04-10

    An oxide or nitride layer is provided on an amorphous semiconductor layer prior to performing metal-induced crystallization of the semiconductor layer. The oxide or nitride layer facilitates conversion of the amorphous material into large grain polycrystalline material. Hence, a native silicon dioxide layer provided on hydrogenated amorphous silicon (a-Si:H), followed by deposited Al permits induced crystallization at temperatures far below the solid phase crystallization temperature of a-Si. Solar cells and thin film transistors can be prepared using this method.

  15. Well-aligned polycrystalline lanthanum silicate oxyapatite grown by reactive diffusion between solid La2SiO5 and gases [SiO+1/2O2

    NASA Astrophysics Data System (ADS)

    Fukuda, Koichiro; Hasegawa, Ryo; Kitagawa, Takuya; Nakamori, Hiroshi; Asaka, Toru; Berghout, Abid; Béchade, Emilie; Masson, Olivier; Jouin, Jenny; Thomas, Philippe

    2016-03-01

    The c-axis-oriented polycrystalline lanthanum silicate oxyapatite, La9.48(Si5.89□0.11)O26 (□ denotes a vacancy in the Si site), was successfully prepared by the reactive diffusion between randomly grain-oriented La2SiO5 polycrystal and [SiO+1/2O2] gases at 1873 K in Ar atmosphere. The polycrystal was characterized using optical microscopy, scanning electron microscopy equipped with energy dispersive X-ray spectroscopy, micro-Raman spectroscopy, X-ray diffractometry, and impedance spectroscopy. The crystal structure (space group P63/m) showed the deficiency of Si site at ca. 1.9%. The bulk oxide-ion conductivity along the grain-alignment direction steadily increased from 9.2 × 10-3 to 1.17 × 10-2 S/cm with increasing temperature from 923 to 1073 K. The activation energy of conduction was 0.23(2) eV.

  16. Near single-crystalline, high-carrier-mobility silicon thin film on a polycrystalline/amorphous substrate

    DOEpatents

    Findikoglu, Alp T.; Jia, Quanxi; Arendt, Paul N.; Matias, Vladimir; Choi, Woong

    2009-10-27

    A template article including a base substrate including: (i) a base material selected from the group consisting of polycrystalline substrates and amorphous substrates, and (ii) at least one layer of a differing material upon the surface of the base material; and, a buffer material layer upon the base substrate, the buffer material layer characterized by: (a) low chemical reactivity with the base substrate, (b) stability at temperatures up to at least about 800.degree. C. under low vacuum conditions, and (c) a lattice crystal structure adapted for subsequent deposition of a semiconductor material; is provided, together with a semiconductor article including a base substrate including: (i) a base material selected from the group consisting of polycrystalline substrates and amorphous substrates, and (ii) at least one layer of a differing material upon the surface of the base material; and, a buffer material layer upon the base substrate, the buffer material layer characterized by: (a) low chemical reactivity with the base substrate, (b) stability at temperatures up to at least about 800.degree. C. under low vacuum conditions, and (c) a lattice crystal structure adapted for subsequent deposition of a semiconductor material, and, a top-layer of semiconductor material upon the buffer material layer.

  17. Recent trends of patents on front TCOs for highly efficient thin-film Si photovoltaic devices.

    PubMed

    Myong, Seung Y

    2014-01-01

    The recent trends of US patents on the front transparent electrode of thin-film silicon (Si) photovoltaic (PV) devices are reviewed. The various transparent conductive oxide (TCO) materials have been invented to satisfy a multifunctional prerequisite for the front electrode: high electrical conductivity, high optical transparency, effective light trapping, anti-reflection effect, and diffusion barrier. The recent surge of filed patents reflects the great importance of the front TCO technology for high efficiency thin-film Si PV devices. Among the TCO materials, properties of commercially available F-doped tin oxide (SnO2:F)-coated glass substrates are compared. SnO2:F-coated glass substrates share 20-30% of the cost for production of thin-film Si PV modules - evaluated values from mass production at KISCO. Therefore, the cost and technological innovation must be established for cost-effective mass production of large-area thin-film Si multijunction PV modules.

  18. Ultra-Low-Cost Room Temperature SiC Thin Films

    NASA Technical Reports Server (NTRS)

    Faur, Maria

    1997-01-01

    The research group at CSU has conducted theoretical and experimental research on 'Ultra-Low-Cost Room Temperature SiC Thin Films. The effectiveness of a ultra-low-cost room temperature thin film SiC growth technique on Silicon and Germanium substrates and structures with applications to space solar sells, ThermoPhotoVoltaic (TPV) cells and microelectronic and optoelectronic devices was investigated and the main result of this effort are summarized.

  19. Laser-induced amorphization of silicon during pulsed-laser irradiation of TiN/Ti/polycrystalline silicon/SiO2/silicon

    NASA Astrophysics Data System (ADS)

    Chong, Y. F.; Pey, K. L.; Wee, A. T. S.; Thompson, M. O.; Tung, C. H.; See, A.

    2002-11-01

    In this letter, we report on the complex solidification structures formed during laser irradiation of a titanium nitride/titanium/polycrystalline silicon/silicon dioxide/silicon film stack. Due to enhanced optical coupling, the titanium nitride/titanium capping layer increases the melt depth of polycrystalline silicon by more than a factor of 2. It is found that the titanium atoms diffuse through the entire polycrystalline silicon layer during irradiation. Contrary to the expected polycrystalline silicon growth, distinct regions of polycrystalline and amorphous silicon are formed instead. Possible mechanisms for the formation of these microstructures are proposed.

  20. The reduction of the change of secondary ions yield in the thin SiON/Si system

    NASA Astrophysics Data System (ADS)

    Sameshima, J.; Yamamoto, H.; Hasegawa, T.; Nishina, T.; Nishitani, T.; Yoshikawa, K.; Karen, A.

    2006-07-01

    For the analyses of gate insulating materials of thin silicon oxy-nitride (SiON) and dielectric films, SIMS is one of the available tool along with TEM and ESCA, etc. Especially, to investigate the distribution of dopant in the thin films, SIMS is appreciably effective in these techniques because of its depth profiling capability and high sensitivity. One of the problem occurring in this SIMS measurement is the change of secondary ion yield at the interface as well as in the layers with different chemical composition. To solve this problem, some groups have researched the phenomenon for SiO 2/Si interface [W. Vandervorst, T. Janssens, R. Loo, M. Caymax, I. Peytier, R. Lindsay, J. Fruhauf, A. Bergmaier, G. Dollinger, Appl. Surf. Sci. 203-204 (2003) 371-376; S. Hayashi, K.Yanagihara, Appl. Surf. Sci. 203-204 (2003) 339-342; M. Barozzi, D. Giubertoni, M.Anderle, M. Bersani, Appl. Surf. Sci. 231-232 (2004) 632-635; T.H. Buyuklimanli, J.W. Marino, S.W. Novak, Appl. Surf. Sci. 231-232 (2004) 636-639]. In the present study, profiles of boron and matrix elements in the Si/SiON layers on Si substrate have been investigated. The sensitivity change of Si and B profiles in SiON layer become smaller by using oxygen flood than those without oxygen flood for both O 2+ and Cs + beam. At the range of 0-25 at.% of N composition, 11B dosimetry in SiON layer implanted through amorphous Si depends on N composition. This trend could be caused by the sensitivity change of 11B, or it indicates real 11B concentration change in SiON lyaer. N areal density determined by Cs + SIMS with oxygen flooding also shows linear relationship with N composition estimated by XPS.

  1. Photovoltaic mechanisms in polycrystalline thin film silicon solar cells. Quarterly technical progress report No. 1, July 30-October 31, 1980

    SciTech Connect

    Sopori, B.

    1980-07-30

    Major accomplishments during the first quarter of the contract period are reported. Small area diode fabrication and analysis has been continued. This technique has further been applied to many RTR ribbons. An optical technique for determination of crystallite orientations has been placed in operation. This technique has many distinct advantages. These are: (1) rapid; (2) can be set-up very inexpensively; (3) well suited for polycrystalline substrates of small grain size; and (4) can easily characterize twins. Accuracies obtained with this technique are about the same as that of the Laue technique. A technique to qualitatively evaluate grain boundary activity in unprocessed substrates has been used and valuable results obtained. Further analysis is being done to use this technique for quantitative evaluation. A major study of G.B. orientation effects is underway. Initial results on RTR ribbons have shown a good correlation of G.B. barrier height with misorientation (tilt boundaries).

  2. Calculating Optical Absorption Spectra of Thin Polycrystalline Organic Films: Structural Disorder and Site-Dependent van der Waals Interaction

    PubMed Central

    2015-01-01

    We propose a new approach for calculating the change of the absorption spectrum of a molecule when moved from the gas phase to a crystalline morphology. The so-called gas-to-crystal shift Δm is mainly caused by dispersion effects and depends sensitively on the molecule’s specific position in the nanoscopic setting. Using an extended dipole approximation, we are able to divide Δm= −QWm in two factors, where Q depends only on the molecular species and accounts for all nonresonant electronic transitions contributing to the dispersion while Wm is a geometry factor expressing the site dependence of the shift in a given molecular structure. The ability of our approach to predict absorption spectra is demonstrated using the example of polycrystalline films of 3,4,9,10-perylenetetracarboxylic diimide (PTCDI). PMID:25834658

  3. Calculating Optical Absorption Spectra of Thin Polycrystalline Organic Films: Structural Disorder and Site-Dependent van der Waals Interaction.

    PubMed

    Megow, Jörg; Körzdörfer, Thomas; Renger, Thomas; Sparenberg, Mino; Blumstengel, Sylke; Henneberger, Fritz; May, Volkhard

    2015-03-12

    We propose a new approach for calculating the change of the absorption spectrum of a molecule when moved from the gas phase to a crystalline morphology. The so-called gas-to-crystal shift Δ[Formula: see text] m is mainly caused by dispersion effects and depends sensitively on the molecule's specific position in the nanoscopic setting. Using an extended dipole approximation, we are able to divide Δ[Formula: see text] m = -QWm in two factors, where Q depends only on the molecular species and accounts for all nonresonant electronic transitions contributing to the dispersion while Wm is a geometry factor expressing the site dependence of the shift in a given molecular structure. The ability of our approach to predict absorption spectra is demonstrated using the example of polycrystalline films of 3,4,9,10-perylenetetracarboxylic diimide (PTCDI).

  4. Moessbauer study in thin films of FeSi2 and FeSe systems

    NASA Technical Reports Server (NTRS)

    Escue, W. J.; Aggarwal, K.; Mendiratta, R. G.

    1978-01-01

    Thin films of FeSi2 and FeSe were studied using Moessbauer spectroscopy information regarding dangling bond configuration and nature of crystal structure in thin films was derived. A significant influence of crystalline aluminum substrate on film structure was observed.

  5. Low Loss, Finite Width Ground Plane, Thin Film Microstrip Lines on Si Wafers

    NASA Technical Reports Server (NTRS)

    Ponchak, George E.; Margomenos, Alexandros; Katehi, Linda P. B.

    1999-01-01

    Si RFICs on standard, 2 Omega-cm. Si wafers require novel transmission lines to reduce the loss caused by the resistive substrate. One such transmission line is commonly called Thin Film Microstrip (TFMS), which is created by depositing a metallic ground plane, thin insulating layers, and the microstrip lines on the Si wafer. Thus, the electric fields are isolated from the Si wafer. In this paper, it is shown through experimental results that the ground plane of TFMS may be finite width and comparable to the strip width in size while still achieving low loss on 2 Omega-cm Si. Measured effective permittivity shows that the field interaction with the Si wafer is small.

  6. Time-Domain Thermoreflectance Measurements of Thermal Transport in Amorphous SiC Thin Films

    NASA Astrophysics Data System (ADS)

    Daly, Brian; Hondongwa, Donald; King, Sean

    2010-03-01

    We present ultrafast optical pump-probe measurements of thermal transport in a series of amorphous SiC samples. The samples were grown on Si wafers by plasma enhanced chemical vapor deposition utilizing various combinations of methylsilanes and H2 and He diluent gases. The sample films were well characterized and found to have densities (1.3 -- 2.3 g cm-3) and dielectric constants (4.0 -- 7.2) that spanned a wide range of values. Prior to their measurement, the samples were coated with 40-70 nm of polycrystalline Al. The pump-probe measurements were performed at room temperature using a modelocked Ti:sapphire laser that produced sub-picosecond pulses of a few nJ. The pulses heat the Al coating, causing a transient reflectivity change. As the Al film cools into the SiC film, the reflectivity change can be measured, giving a measure of the thermal effusivity of the SiC film. We then extract values for the thermal conductivity of the SiC films and find that it varies from less than half of the thermal conductivity of amorphous SiO2 for the lower density materials to somewhat larger than amorphous SiO2 for the highest density films.

  7. The electro-optical behavior of liquid crystal molecules on the surface of SiO2 inorganic thin films.

    PubMed

    Sung, Shi-Joon; Yang, Kee-Jeong; Kim, Dae-Hwan; Do, Yun Seon; Kang, Jin-Kyu; Choi, Byeong-Dae

    2009-12-01

    Inorganic thin films are well known for the liquid crystal alignment layers for LCoS application due to the higher thermal and photochemical stability of inorganic materials. The switching time of liquid crystals is the important factor for the projection application and the faster switching time is required for the high quality display. The switching behavior of liquid crystal molecules on inorganic thin films might be closely related with the surface properties of the inorganic thin films. Therefore the understanding of surface properties of the inorganic thin films is required for the enhancement of the switching time of liquid crystals of LCoS devices. In this work, we prepared the SiO2 inorganic thin films and the electro-optical behavior of liquid crystal molecules on SiO2 thin film was investigated. The sputtering condition of SiO2 thin film was closely related with the thickness and the surface morphology of SiO2 thin film. The switching time of liquid crystals with negative dielectric constant on SiO2 inorganic thin films was dominantly affected by the size of protrusion on the surface of SiO2 thin film and the surface roughness of SiO2 thin film was also related with the switching time of liquid crystals. From these results, it is possible to prepare the SiO2 inorganic thin film suitable for the liquid crystal alignment layer for VAN LC mode.

  8. Strain engineering effects on electrical properties of lead-free piezoelectric thin films on Si wafers.

    PubMed

    Ohno, Tomoya; Kamai, Yuto; Oda, Yuutaro; Sakamoto, Naonori; Matsuda, Takeshi; Wakiya, Naoki; Suzuki, Hisao

    2014-01-01

    Using radio frequency - magnetron sputtering, calcium-doped barium zirconate titanate ((Ba(0.85)Ca(0.15))(Zr(0.1)Ti(0.9))O(3), BCZT) thin films were deposited on Si wafers with different bottom electrodes. The obtained BCZT thin film on a lanthanum nickel oxide (LNO) electrode had a highly c-axis preferred orientation, while the BCZT thin film on a Pt bottom electrode had (111) preferred orientation. Furthermore, the out-of-plane lattice constant of the BCZT on LNO/Si was 3.4% larger than that of the reported bulk material because of the compressive thermal stress from LNO with a large thermal expansion coefficient. This compressive thermal stress engenders an increase of the Curie temperature. The local piezoelectric response of the BCZT thin film on a LNO/Si structure was measured by piezoresponse force microscope.

  9. Effect of film thickness on the magneto-structural properties of ion beam sputtered transition metal-metalloid FeCoNbB/Si (100) alloy thin films

    NASA Astrophysics Data System (ADS)

    Gupta, Pooja; Tripathi, Yagyanidhi; Kumar, Dileep; Rai, S. K.; Gupta, Mukul; Reddy, V. R.; Svec, Peter

    2016-08-01

    The structure and magnetic properties of ion beam sputtered transition metal-metalloid FeCoNbB/Si(100) alloy thin film have been studied as a function of film thickness using complementary techniques of x-ray reflectivity (XRR), grazing incidence x-ray diffraction, and magneto optical Kerr effect. Thicknesses of the films range from ˜200 to 1500 Å. The coercivity of all the films ranges between 4 and 14 Oe, which suggests soft magnetic nature of FeCoNbB/Si thin films. Films with thickness up to 800 Å are amorphous in nature and are found to possess uniaxial magnetic anisotropy in the film plane, although no magnetic field was applied during deposition. The presence of the two fold symmetry in such amorphous thin films may be attributed to quenched-in stresses developed during deposition. Upon increasing the film thickness to ˜1200 Å and above, the structure of FeCoNbB films transforms from amorphous to partially nanocrystalline structure and has bcc-FeCo nanocrystalline phase dispersed in remaining amorphous matrix. The crystalline volume fraction (cvf) of the films is found to be proportional to the film thickness. Azimuthal angle dependence of remanence confirms the presence of in-plane four-fold anisotropy (FFA) in the crystalline film with cvf ˜75%. Synchrotron x-ray diffraction measurement using area detector suggests random orientation of crystallites and thus clearly establishes that FFA is not related to texture/cubic symmetry in such polycrystalline thin films. As supported by asymmetric Bragg diffraction measurements, the origin of FFA in such partially crystalline thin film is ascribed to the additional compressive stresses developed in the film upon crystallization. Results indicate that promising soft magnetic properties in such films can be optimized by controlling the film thickness. The revelation of controllable and tunable anisotropy suggests that FeCoNbB thin films can have potential application in electromagnetic applications.

  10. Thin film solar cells with Si nanocrystallites embedded in amorphous intrinsic layers by hot-wire chemical vapor deposition.

    PubMed

    Park, Seungil; Parida, Bhaskar; Kim, Keunjoo

    2013-05-01

    We investigated the thin film growths of hydrogenated silicon by hot-wire chemical vapor deposition with different flow rates of SiH4 and H2 mixture ambient and fabricated thin film solar cells by implementing the intrinsic layers to SiC/Si heterojunction p-i-n structures. The film samples showed the different infrared absorption spectra of 2,000 and 2,100 cm(-1), which are corresponding to the chemical bonds of SiH and SiH2, respectively. The a-Si:H sample with the relatively high silane concentration provides the absorption peak of SiH bond, but the microc-Si:H sample with the relatively low silane concentration provides the absorption peak of SiH2 bond as well as SiH bond. Furthermore, the microc-Si:H sample showed the Raman spectral shift of 520 cm(-1) for crystalline phase Si bonds as well as the 480 cm(-1) for the amorphous phase Si bonds. These bonding structures are very consistent with the further analysis of the long-wavelength photoconduction tail and the formation of nanocrystalline Si structures. The microc-Si:H thin film solar cell has the photovoltaic behavior of open circuit voltage similar to crystalline silicon thin film solar cell, indicating that microc-Si:H thin film with the mixed phase of amorphous and nanocrystalline structures show the carrier transportation through the channel of nanocrystallites.

  11. Structural and optical characterization of pure Si-rich nitride thin films

    PubMed Central

    2013-01-01

    The specific dependence of the Si content on the structural and optical properties of O- and H-free Si-rich nitride (SiNx>1.33) thin films deposited by magnetron sputtering is investigated. A semiempirical relation between the composition and the refractive index was found. In the absence of Si-H, N-H, and Si-O vibration modes in the FTIR spectra, the transverse and longitudinal optical (TO-LO) Si-N stretching pair modes could be unambiguously identified using the Berreman effect. With increasing Si content, the LO and the TO bands shifted to lower wavenumbers, and the LO band intensity dropped suggesting that the films became more disordered. Besides, the LO and the TO bands shifted to higher wavenumbers with increasing annealing temperature which may result from the phase separation between Si nanoparticles (Si-np) and the host medium. Indeed, XRD and Raman measurements showed that crystalline Si-np formed upon 1100°C annealing but only for SiNx<0.8. Besides, quantum confinement effects on the Raman peaks of crystalline Si-np, which were observed by HRTEM, were evidenced for Si-np average sizes between 3 and 6 nm. A contrario, visible photoluminescence (PL) was only observed for SiNx>0.9, demonstrating that this PL is not originating from confined states in crystalline Si-np. As an additional proof, the PL was quenched while crystalline Si-np could be formed by laser annealing. Besides, the PL cannot be explained neither by defect states in the bandgap nor by tail to tail recombination. The PL properties of SiNx>0.9 could be then due to a size effect of Si-np but having an amorphous phase. PMID:23324447

  12. Formation of β-FeSi 2 thin films by partially ionized vapor deposition

    NASA Astrophysics Data System (ADS)

    Harada, Noriyuki; Takai, Hiroshi

    2003-05-01

    The partially ionized vapor deposition (PIVD) is proposed as a new method to realize low temperature formation of β-FeSi 2 thin films. In this method, Fe is evaporated by E-gun and a few percents of Fe atoms are ionized. We have investigated influences of the ion content and the accelerating voltage of Fe ions on the structural properties of β-FeSi 2 films deposited on Si substrates. It was confirmed that β-FeSi 2 can be formed on Si(1 0 0) substrate by PIVD even at substrate temperature as low as 350, while FeSi by the conventional vacuum deposition. It was concluded that the influence of Fe ions on preferential orientation of β-FeSi 2 depends strongly on the content and the acceleration energy of ions.

  13. Barrier properties and failure mechanism of Ta-Si-N thin films for Cu interconnection

    NASA Astrophysics Data System (ADS)

    Lee, Yoon-Jik; Suh, Bong-Seok; Kwon, Myoung Seok; Park, Chong-Ook

    1999-02-01

    Cosputtered Ta-Si-N amorphous films of ten different compositions were investigated as a barrier material for Cu interconnection. The films of relatively low nitrogen content (<47 at. %) undergo an abrupt failure with the formation of tantalum silicides and copper silicide between Si and Cu during annealing. Ta43Si4N53 thin film is readily crystallized into TaNx in spite of a remarkable chemical stability with Cu. The films containing nitrogen more than 51 at. % are sacrificial barriers which show the formation of Cu3Si phase at Ta-Si-N/Cu interface even before the films crystallize to form tantalum silicide. According to electrical tests, the barriers which show the sacrificial characteristics are most effective and show no electrical degradation even after annealing at 500 °C for an hour in Si/Cu and 525 °C for an hour in SiO2/Cu metallization.

  14. MOCVD of ZnO thin films for potential use as compliant layers for GaN on Si

    NASA Astrophysics Data System (ADS)

    Black, Kate; Jones, Anthony C.; Chalker, Paul R.; Gaskell, Jeffrey M.; Murray, Robert T.; Joyce, Tim B.; Rushworth, Simon A.

    2008-03-01

    This paper explores the use of nanostructured zinc oxide (ZnO) films as a compliant buffer layer for the growth of gallium nitride (GaN) on silicon substrates. Thin films of ZnO have been deposited on silicon (1 1 1) substrates by liquid injection metalorganic chemical vapour deposition (MOCVD) using dimethyl zinc-tetrahydrofuran adduct and oxygen. The use of the adduct complex avoids pre-reaction between the dialkyl zinc complex and oxygen which has been observed elsewhere. ZnO films deposited by this method were stoichiometric and of high purity, with no detectable carbon contamination. Films were deposited over a temperature range 350-550 °C, and exhibited a nanowire-like morphology. Subsequent deposition of GaN layers grown by molecular beam epitaxy (MBE) on the ZnO film resulted in the transformation of the nanowires to gallium oxide, accompanied by virtually complete removal of zinc from the layer. A heteroepitaxially oriented ( c-axis) GaN/gallium oxide/silicon structure was produced after the nitride deposition which consisted of characteristic columnar GaN with the GaN[0 0 0 1]||Si [1 1 1]. Selective area electron diffraction of the by-product oxide interlayer showed a polycrystalline-like behaviour that gave rise to a random azimuthal distribution of the GaN grains.

  15. Computational Study of In-Plane Phonon Transport in Si Thin Films

    PubMed Central

    Wang, Xinjiang; Huang, Baoling

    2014-01-01

    We have systematically investigated the in-plane thermal transport in Si thin films using an approach based on the first-principles calculations and lattice dynamics. The effects of phonon mode depletion induced by the phonon confinement and the corresponding variation in interphonon scattering, which may be important for the thermal conductivities of ultra-thin films but are often neglected in precedent studies, are considered in this study. The in-plane thermal conductivities of Si thin films with different thicknesses have been predicted over a temperature range from 80 K to 800 K and excellent agreements with experimental results are found. The validities of adopting the bulk phonon properties and gray approximation of surface specularity in thin film studies have been clarified. It is found that in ultra-thin films, while the phonon depletion will reduce the thermal conductivity of Si thin films, its effect is largely offset by the reduction in the interphonon scattering rate. The contributions of different phonon modes to the thermal transport and isotope effects in Si films with different thicknesses under various temperatures are also analyzed. PMID:25228061

  16. High efficiency polycrystalline silicon solar cells using low temperature PECVD process

    SciTech Connect

    Elgamel, H.E.A.

    1998-10-01

    Conventionally directionally solidified (DS) and silicon film (SF) polycrystalline silicon solar cells are fabricated using gettering and low temperature plasma enhanced chemical vapor deposition (PECVD) passivation. Thin layer ({approximately}10 nm) of PECVD SiO{sub 2} is used to passivate the emitter of the solar cell, while direct hydrogen rf plasma and PECVD silicon nitride (Si{sub 3}N{sub 4}) are implemented to provide emitter and bulk passivation. It is found in this work that hydrogen rf plasma can significantly improve the solar cell blue and long wavelength responses when it is performed through a thin layer of PECVD Si{sub 3}N{sub 4}. High efficiency DS and SF polycrystalline silicon solar cells have been achieved using a simple solar cell process with uniform emitter, Al/POCL{sub 3} gettering, hydrogen rf plasma/PECVD Si{sub 3}N{sub 4} and PECVD SiO{sub 2} passivation. On the other hand, a comprehensive experimental study of the characteristics of the PECVD Si{sub 3}N{sub 4} layer and its role in improving the efficiency of polycrystalline silicon solar cells is carried out in this paper. For the polycrystalline silicon used in this investigation, it is found that the PECVD Si{sub 3}N{sub 4} layer doesn`t provide a sufficient cap for the out diffusion of hydrogen at temperatures higher than 500 C. Low temperature ({le}400 C) annealing of the PECVD Si{sub 3}N{sub 4} provides efficient hydrogen bulk passivation, while higher temperature annealing relaxes the deposition induced stress and improves mainly the short wavelength (blue) response of the solar cells.

  17. Behavior of oxygen doped SiC thin films: An x-ray photoelectron spectroscopy study

    NASA Astrophysics Data System (ADS)

    Avila, A.; Montero, I.; Galán, L.; Ripalda, J. M.; Levy, R.

    2001-01-01

    Thin silicon carbide films have been deposited by chemical vapor deposition on p-type (100) silicon substrates. The composition and bonds formed in these films have been analyzed by x-ray photoelectron spectroscopy (XPS) and infrared spectroscopy. The native surface oxide on the silicon carbide surface induced by air exposure has also been studied. Several phases are detected in the near-surface region: elemental Si, Si oxides (mainly SiO2), Si carbide (SiC) and Si oxicarbides (SiOxCy). Quantitative XPS analysis results indicate that, for atomic oxygen fractions <0.15, the Si-C phases are dominant in the films. Above this value no silicon oxicarbide is observed, but a multiphase material formed by elemental Si, Si oxides and Si carbides is observed. In spite of the film being a complex phase mixture, a simple relationship is found between the overall carbon and oxygen compositions. The carbon atomic fraction in the film decreases quasilinearly as the oxygen content increases, with a slope of about -1. An overall composition of SiOxC3-x in the 0.5

  18. Exploring the potential of semiconducting BaSi2 for thin-film solar cell applications

    NASA Astrophysics Data System (ADS)

    Suemasu, Takashi; Usami, Noritaka

    2017-01-01

    Semiconducting barium disilicide (BaSi2), which is composed of earth-abundant elements, has attractive features for thin-film solar cell applications. Both a large absorption coefficient comparable to copper indium gallium diselenide and a minority-carrier diffusion length much larger than the grain size of BaSi2 can be used to improve solar cell properties. In this review article, we explore the potential of semiconducting BaSi2 film for thin-film solar cell applications. We start by describing its crystal and energy band structure, followed by discussing thin-film growth techniques and the optical and electrical properties of BaSi2 films. We use a first-principles calculation based on density-functional theory to calculate the position of the Fermi level to predict the carrier type of impurity-doped BaSi2 films using either a group 13 or 15 element, and compare the calculated results with the experimental ones. Special attention was paid to the minority-carrier properties, such as minority-carrier lifetime, minority-carrier diffusion length, and surface passivation. The potential variations across the grain boundaries measured by Kelvin-probe force microscopy allowed us to detect a larger minority-carrier diffusion length in BaSi2 on Si(1 1 1) compared with BaSi2 on Si(0 0 1). Finally, we demonstrate the operation of p-BaSi2/n-Si heterojunction solar cells and discuss prospects for future development.

  19. Origins of electrostatic potential wells at dislocations in polycrystalline Cu(In,Ga)Se{sub 2} thin films

    SciTech Connect

    Dietrich, J.; Abou-Ras, D. Schmidt, S. S.; Rissom, T.; Unold, T.; Cojocaru-Mirédin, O.; Niermann, T.; Lehmann, M.; Koch, C. T.; Boit, C.

    2014-03-14

    Thin-film solar cells based on Cu(In,Ga)Se{sub 2} (CIGSe) reach high power-conversion efficiencies in spite of large dislocation densities of up to 10{sup 10}–10{sup 11} cm{sup −2}. The present work gives insight into the structural and compositional properties of dislocations in CIGSe thin films, which are embedded in a complete solar cell stack. These properties are related to the average electrical potential distributions obtained by means of inline electron holography. At a part of the dislocations studied, the average electrostatic potential shows local minima, all with depths of about −1.4 V. The measured average electrostatic potential distributions were modeled in order to reveal possible influences from strain fields, excess charge, and also compositional changes at the dislocation core. Cu depletion around the dislocation core, as evidenced by atom-probe tomography, explains best the measured potential wells. Their influences of the strain field around the dislocation core and of excess charge at the dislocation core are small. A structural model of dislocations in CIGSe thin films is provided which includes a Cu-depleted region around the dislocation core and gives a possible explanation for why decent photovoltaic performances are possible in the presence of rather large dislocation densities.

  20. Origins of electrostatic potential wells at dislocations in polycrystalline Cu(In,Ga)Se2 thin films

    NASA Astrophysics Data System (ADS)

    Dietrich, J.; Abou-Ras, D.; Schmidt, S. S.; Rissom, T.; Unold, T.; Cojocaru-Mirédin, O.; Niermann, T.; Lehmann, M.; Koch, C. T.; Boit, C.

    2014-03-01

    Thin-film solar cells based on Cu(In,Ga)Se2 (CIGSe) reach high power-conversion efficiencies in spite of large dislocation densities of up to 1010-1011 cm-2. The present work gives insight into the structural and compositional properties of dislocations in CIGSe thin films, which are embedded in a complete solar cell stack. These properties are related to the average electrical potential distributions obtained by means of inline electron holography. At a part of the dislocations studied, the average electrostatic potential shows local minima, all with depths of about -1.4 V. The measured average electrostatic potential distributions were modeled in order to reveal possible influences from strain fields, excess charge, and also compositional changes at the dislocation core. Cu depletion around the dislocation core, as evidenced by atom-probe tomography, explains best the measured potential wells. Their influences of the strain field around the dislocation core and of excess charge at the dislocation core are small. A structural model of dislocations in CIGSe thin films is provided which includes a Cu-depleted region around the dislocation core and gives a possible explanation for why decent photovoltaic performances are possible in the presence of rather large dislocation densities.

  1. Strain relaxation mechanisms in compressively strained thin SiGe-on-insulator films grown by selective Si oxidation

    NASA Astrophysics Data System (ADS)

    Gunji, Marika; Marshall, Ann F.; McIntyre, Paul C.

    2011-01-01

    We report on strain relaxation mechanisms in highly compressive-strained (0.67%-2.33% biaxial strain), thin SiGe-on-insulator (SGOI) structures with Ge atomic fraction ranging from 0.18 to 0.81. SGOI layers (8.7-75 nm thickness) were fabricated by selective oxidization of Si from compressively strained SiGe films epitaxially grown on single crystalline Si-on-insulator (SOI) layers. During high temperature oxidation annealing, strain relaxation occurred due to both intrinsic stacking fault (SF) formation and biaxial stress-driven buckling of the SiGe layers through viscous flow of the overlying and underlying SiO2 layers. Transmission electron microscopy (TEM) and x-ray diffraction were performed to confirm the simultaneous occurrence of these two strain relaxation mechanisms. The results indicate that ˜30 % of the observed strain relaxation can be attributed to formation of intrinsic SFs and the remaining strain relaxation to stress-driven buckling of the SiGe layers. In addition, cross-sectional TEM images show that some of the SFs and layer buckling roughness appears to be spatially correlated.

  2. Fracture-induced amorphization of polycrystalline SiO2 stishovite: a potential platform for toughening in ceramics.

    PubMed

    Nishiyama, Norimasa; Wakai, Fumihiro; Ohfuji, Hiroaki; Tamenori, Yusuke; Murata, Hidenobu; Taniguchi, Takashi; Matsushita, Masafumi; Takahashi, Manabu; Kulik, Eleonora; Yoshida, Kimiko; Wada, Kouhei; Bednarcik, Jozef; Irifune, Tetsuo

    2014-10-09

    Silicon dioxide has eight stable crystalline phases at conditions of the Earth's rocky parts. Many metastable phases including amorphous phases have been known, which indicates the presence of large kinetic barriers. As a consequence, some crystalline silica phases transform to amorphous phases by bypassing the liquid via two different pathways. Here we show a new pathway, a fracture-induced amorphization of stishovite that is a high-pressure polymorph. The amorphization accompanies a huge volume expansion of ~100% and occurs in a thin layer whose thickness from the fracture surface is several tens of nanometers. Amorphous silica materials that look like strings or worms were observed on the fracture surfaces. The amount of amorphous silica near the fracture surfaces is positively correlated with indentation fracture toughness. This result indicates that the fracture-induced amorphization causes toughening of stishovite polycrystals. The fracture-induced solid-state amorphization may provide a potential platform for toughening in ceramics.

  3. Thermal conductivity measurement and interface thermal resistance estimation using SiO2 thin film.

    PubMed

    Chien, Heng-Chieh; Yao, Da-Jeng; Huang, Mei-Jiau; Chang, Tien-Yao

    2008-05-01

    In this paper, we describe an easy-to-use method to measure the thermal conductivity of thin films based on an electrical heating/sensing mechanism and a steady-state technique. The method used relative commonly used instruments, and without any signal processing circuit, is easy to be used in such thin-film thermal conductivity measurement. The SiO2 thin-film samples, prepared by thermal oxidation, plasma enhanced chemical vapor deposition (PECVD), and E-beam evaporator, were deposited on a silicon substrate. The apparent thermal conductivity, the intrinsic thermal conductivity of SiO2 films, and the total interface thermal resistance of the heater/SiO2/silicon system were evaluated. Our data showed agreement with those data obtained from previous literatures and from the 3 omega method. Furthermore, by using a sandwiched structure, the interface thermal resistance of Cr/PECVD SiO2 and PECVD SiO2/silicon were also separately evaluated in this work. The data showed that the interface thermal resistance of Cr/PECVD SiO2 (metal/dielectric) is about one order of magnitude larger than that of PECVD SiO2/silicon (dielectric/dielectric).

  4. Full potential of radial junction Si thin film solar cells with advanced junction materials and design

    NASA Astrophysics Data System (ADS)

    Qian, Shengyi; Misra, Soumyadeep; Lu, Jiawen; Yu, Zhongwei; Yu, Linwei; Xu, Jun; Wang, Junzhuan; Xu, Ling; Shi, Yi; Chen, Kunji; Roca i Cabarrocas, Pere

    2015-07-01

    Combining advanced materials and junction design in nanowire-based thin film solar cells requires a different thinking of the optimization strategy, which is critical to fulfill the potential of nano-structured photovoltaics. Based on a comprehensive knowledge of the junction materials involved in the multilayer stack, we demonstrate here, in both experimental and theoretical manners, the potential of hydrogenated amorphous Si (a-Si:H) thin film solar cells in a radial junction (RJ) configuration. Resting upon a solid experimental basis, we also assess a more advanced tandem RJ structure with radially stacking a-Si:H/nanocrystalline Si (nc-Si:H) PIN junctions, and show that a balanced photo-current generation with a short circuit current density of Jsc = 14.2 mA/cm2 can be achieved in a tandem RJ cell, while reducing the expensive nc-Si:H absorber thickness from 1-3 μ m (in planar tandem cells) to only 120 nm. These results provide a clearly charted route towards a high performance Si thin film photovoltaics.

  5. Fabrication and properties of strip casting 4.5 wt% Si steel thin sheet

    NASA Astrophysics Data System (ADS)

    Zu, Guoqing; Zhang, Xiaoming; Zhao, Jingwei; Wang, Yuqian; Yan, Yi; Li, Chengang; Cao, Guangming; Jiang, Zhengyi

    2017-02-01

    Three 4.5 wt% Si steel thin sheets with different thicknesses were efficiently fabricated by twin-roll strip casting, warm rolling and cold rolling followed by final annealing. A comprehensive investigation from the workability of the as-cast strip to the magnetic property of the produces was performed to illustrate the superiority of the new materials. The results show that the as-cast strip, which has a much lower Vickers hardness than that of the 6.5 wt% Si steel, is suitable for rolling processing. The X-ray diffraction (XRD) and transmission electron microscopy (TEM) studies confirm that no ordering phase exists in the as-cast strip. The cold-rolled thin sheets exhibit good surface quality without edge cracks. Furthermore, all the three 4.5 wt% Si steel thin sheets possess relative strong <100>//ND texture and present high magnetic inductions and low iron losses after finial annealing.

  6. Corrosion resistance of sintered NdFeB coated with SiC/Al bilayer thin films by magnetron sputtering

    NASA Astrophysics Data System (ADS)

    Huang, Yiqin; Li, Heqin; Zuo, Min; Tao, Lei; Wang, Wei; Zhang, Jing; Tang, Qiong; Bai, Peiwen

    2016-07-01

    The poor corrosion resistance of sintered NdFeB imposes a great challenge in industrial applications. In this work, the SiC/Al bilayer thin films with the thickness of 510 nm were deposited on sintered NdFeB by magnetron sputtering to improve the corrosion resistance. A 100 nm Al buffer film was used to reduce the internal stress between SiC and NdFeB and improve the surface roughness of the SiC thin film. The morphologies and structures of SiC/Al bilayer thin films and SiC monolayer film were investigated with FESEM, AFM and X-ray diffraction. The corrosion behaviors of sintered NdFeB coated with SiC monolayer film and SiC/Al bilayer thin films were analyzed by polarization curves. The magnetic properties were measured with an ultra-high coercivity permanent magnet pulse tester. The results show that the surface of SiC/Al bilayer thin films is more compact and uniform than that of SiC monolayer film. The corrosion current densities of SiC/Al bilayer films coated on NdFeB in acid, alkali and salt solutions are much lower than that of SiC monolayer film. The SiC/Al bilayer thin films have little influence to the magnetic properties of NdFeB.

  7. Development of Nanosphere Lithography Technique with Enhanced Lithographical Accuracy on Periodic Si Nanostructure for Thin Si Solar Cell Application

    NASA Astrophysics Data System (ADS)

    Choi, Jeayoung

    In this thesis, a novel silica nanosphere (SNS) lithography technique has been developed to offer a fast, cost-effective, and large area applicable nano-lithography approach. The SNS can be easily deposited with a simple spin-coating process after introducing a N,N-dimethyl-formamide (DMF) solvent which can produce a highly close packed SNS monolayer over large silicon (Si) surface area, since DMF offers greatly improved wetting, capillary and convective forces in addition to slow solvent evaporation rate. Since the period and dimension of the surface pattern can be conveniently changed and controlled by introducing a desired size of SNS, and additional SNS size reduction with dry etching process, using SNS for lithography provides a highly effective nano-lithography approach for periodically arrayed nano-/micro-scale surface patterns with a desired dimension and period. Various Si nanostructures ( i.e., nanopillar, nanotip, inverted pyramid, nanohole) are successfully fabricated with the SNS nano-lithography technique by using different etching technique like anisotropic alkaline solution (i.e., KOH) etching, reactive-ion etching (RIE), and metal-assisted chemical etching (MaCE). In this research, computational optical modeling is also introduced to design the Si nanostructure, specifically nanopillars (NPs) with a desired period and dimension. The optical properties of Si NP are calculated with two different optical modeling techniques, which are the rigorous coupled wave analysis (RCWA) and finite-difference time-domain (FDTD) methods. By using these two different optical modeling techniques, the optical properties of Si NPs with different periods and dimensions have been investigated to design ideal Si NP which can be potentially used for thin c-Si solar cell applications. From the results of the computational and experimental work, it was observed that low aspect ratio Si NPs fabricated in a periodic hexagonal array can provide highly enhanced light absorption

  8. Superconducting YBa{sub 2}Cu{sub 3}O{sub 7{minus}x} thin films on polycrystalline ferrite for magnetically tunable microwave components

    SciTech Connect

    Jia, Q.X.; Findikoglu, A.T.; Arendt, P.; Foltyn, S.R.; Roper, J.M.; Groves, J.R.; Coulter, J.Y.; Li, Y.Q.; Dionne, G.F.

    1998-04-01

    Superconducting YBa{sub 2}Cu{sub 3}O{sub 7{minus}x} (YBCO) thin films with a surface resistance of 0.86 m{Omega} at 10 GHz and 76 K have been grown on polycrystalline ferrite yttrium iron garnet (YIG) substrates. The chemical and structural mismatches between YBCO and YIG are solved by using a double buffer layer of biaxially oriented yttria-stabilized zirconia (YSZ) and CeO{sub 2}, where YSZ is deposited by an ion-beam-assisted-deposition technique. The YBCO films are {ital c} axis oriented with an in-plane mosaic spread [full width at half maximum of an x-ray {phi}-scan on (103) reflection] of less than 8{degree}. The films have a superconductive transition temperature above 88 K with a transition width less than 0.3 K, giving a critical current density above 10{sup 6}A/cm{sup 2} in self field at 75 K. At 75 K in an external magnetic field of 1 T perpendicular to the film surface, the films maintain a critical current density over 2{times}10{sup 5}A/cm{sup 2}. {copyright} {ital 1998 American Institute of Physics.}

  9. Examination of a polycrystalline thin-film model to explore the relation between probe size and structural correlation length in fluctuation electron microscopy.

    PubMed

    Treacy, M M J; Gibson, J M

    2012-02-01

    We examine simulated electron microdiffraction patterns from models of thin polycrystalline silicon. The models are made by a Voronoi tessellation of random points in a box. The Voronoi domains are randomly selected to contain either a randomly-oriented cubic crystalline grain or a region of continuous random network material. The microdiffraction simulations from coherent probes of different widths are computed at the ideal kinematical limit, ignoring inelastic and multiple scattering. By examining the normalized intensity variance that is obtained in fluctuation electron microscopy experiments, we confirm that intensity fluctuations increase monotonically with the percentage of crystalline grains in the material. However, anomalously high variance is observed for models that have 100% crystalline grains with no imperfections. We confirm that the reduced normalized variance, V(k,R) - 1, that is associated with four-body correlations at scattering vector k, varies inversely with specimen thickness. Further, for probe sizes R larger than the mean grain size, we confirm that the reduced normalized variance obeys the predicted form given by Gibson et al. [Ultramicroscopy, 83, 169-178 (2000)] for the kinematical coherent scattering limit.

  10. Development of active matrix flat panel imagers incorporating thin layers of polycrystalline HgI(2) for mammographic x-ray imaging.

    PubMed

    Jiang, Hao; Zhao, Qihua; Antonuk, Larry E; El-Mohri, Youcef; Gupta, Tapan

    2013-02-07

    Active matrix flat-panel imagers (AMFPIs) offer many advantages and have become ubiquitous across a wide variety of medical x-ray imaging applications. However, for mammography, the imaging performance of conventional AMFPIs incorporating CsI:Tl scintillators or a-Se photoconductors is limited by their relatively modest signal-to-noise ratio (SNR), particularly at low x-ray exposures or high spatial resolution. One strategy for overcoming this limitation involves the use of a high gain photoconductor such as mercuric iodide (HgI(2)) which has the potential to improve the SNR by virtue of its low effective work function (W(EFF)). In this study, the performance of direct-detection AMFPI prototypes employing relatively thin layers of polycrystalline HgI(2) operated under mammographic irradiation conditions over a range of 0.5 to 16.0 mR is presented. High x-ray sensitivity (corresponding to W(EFF) values of ∼19 eV), low dark current (<0.1 pA mm(-2)) and good spatial resolution, largely limited by the size of the pixel pitch, were observed. For one prototype, a detective quantum efficiency of ∼70% was observed at an x-ray exposure of ∼0.5 mR at 26 kVp.

  11. CBED and FE Study of Thin Foil Relaxation in Cross-Section Samples of Si /Si1-xGex and Si /Si1-xGex /Si Heterostructures

    NASA Astrophysics Data System (ADS)

    Alexandre, L.; Jurczak, G.; Alfonso, C.; Saikly, W.; Grosjean, C.; Charai, A.; Thibault, J.

    In order to determine residual stress/strain fields in CMOS devices and validate tools used to quantify the strain field, we first studied residual strains in Si/Si1-xGex and Si/Si1-xGex/Si TEM samples. Because of sample thinning for TEM observations, elastic relaxation occurs and modifies the initial stress present in the bulk sample. Nevertheless, if the main parameters which play a role on the elastic relaxation process can be determined, we show that it is possible to reproduce from FE and diffraction simulations the complex profile of the HOLZ lines observed on experimental CBED patterns which makes possible the determination of the initial stress state.

  12. Spalling of a Thin Si Layer by Electrodeposit-Assisted Stripping

    NASA Astrophysics Data System (ADS)

    Kwon, Youngim; Yang, Changyol; Yoon, Sang-Hwa; Um, Han-Don; Lee, Jung-Ho; Yoo, Bongyoung

    2013-11-01

    A major goal in solar cell research is to reduce the cost of the final module. Reducing the thickness of the crystalline silicon substrate to several tens of micrometers can reduce material costs. In this work, we describe the electrodeposition of a Ni-P alloy, which induces high stress in the silicon substrate at room temperature. The induced stress enables lift-off of the thin-film silicon substrate. After lift-off of the thin Si film, the mother substrate can be reused, reducing material costs. Moreover, the low-temperature process expected to be improved Si substrate quality.

  13. High efficiency thin-film crystalline Si/Ge tandem solar cell.

    PubMed

    Sun, G; Chang, F; Soref, R A

    2010-02-15

    We propose and simulate a photovoltaic solar cell comprised of Si and Ge pn junctions in tandem. With an anti-reflection film at the front surface, we have shown that optimal solar cells favor a thin Si layer and a thick Ge layer with a thin tunnel hetero-diode placed in between. We predict efficiency ranging from 19% to 28% for AM1.5G solar irradiance concentrated from 1 approximately 1000 Suns for a cell with a total thickness approximately 100 microm.

  14. Hopping conduction in polycrystalline semiconductors

    NASA Astrophysics Data System (ADS)

    Sharma, R. P.; Shukla, A. K.; Kapoor, A. K.; Srivastava, R.; Mathur, P. C.

    1985-03-01

    Measurements of dc conductivity (sigma) on polycrystalline semiconductors, viz., InSb, Si, and CdTe, have been reported in the temperature range 77-300 K. The conduction mechanism near liquid-nitrogen temperature has been identified as the hopping of charge carriers from the charged trap centers to empty traps near the Fermi level.

  15. Epitaxial Cu{sub 2}ZnSnS{sub 4} thin film on Si (111) 4° substrate

    SciTech Connect

    Song, Ning; Liu, Fangyang; Huang, Yidan; Hao, Xiaojing E-mail: xj.hao@unsw.edu.au; Green, Martin A.; Young, Matthew; Erslev, Pete; Harvey, Steven P.; Teeter, Glenn E-mail: xj.hao@unsw.edu.au; Wilson, Samual

    2015-06-22

    To explore the possibility of Cu{sub 2}ZnSnS{sub 4} (CZTS)/Si based tandem solar cells, the heteroepitaxy of tetragonal Cu{sub 2}ZnSnS{sub 4} thin films on single crystalline cubic Si (111) wafers with 4° miscut is obtained by molecular beam epitaxy. The X-ray θ-2θ scan and selected area diffraction patterns of the CZTS thin films and Si substrates, and the high resolution transmission electron microscopy image of the CZTS/Si interface region demonstrate that the CZTS thin films are epitaxially grown on the Si substrates. A CZTS/Si P-N junction is formed and shows photovoltaic responses, indicating the promising application of epitaxial CZTS thin films on Si.

  16. Nanoscale control of Si nanoparticles within a 2D hexagonal array embedded in SiO2 thin films

    NASA Astrophysics Data System (ADS)

    Castro, Celia; BenAssayag, Gérard; Pecassou, Béatrice; Andreozzi, Andrea; Seguini, Gabriele; Perego, Michele; Schamm-Chardon, Sylvie

    2017-01-01

    In this work, we investigate the ability to control Si nanoparticles (NPs) spatially arranged in a hexagonal network of 20 nm wide nanovolumes at controlled depth within SiO2 thin films. To achieve this goal an unconventional lithographic technique was implemented based on a bottom-up approach, that is fully compatible with the existing semiconductor technology. The method combines ultra-low energy ion beam synthesis with nanostructured block-copolymer thin films that are self-assembled on the SiO2 substrates to form a nanoporous template with hexagonally packed pores. A systematic analytical investigation using time of flight-secondary ion mass spectroscopy and low-loss energy filtered transmission electron microscopy demonstrates that by adjusting few fabrication parameters, it is possible to narrow the size distribution of the NPs and to control the number of NPs per nanovolume. Experimental results are critically discussed on the basis of literature data, providing a description of the mechanism involved in the formation of Si NPs.

  17. The effect of Ta doping in polycrystalline TiO{sub x} and the associated thin film transistor properties

    SciTech Connect

    Ok, Kyung-Chul Park, Yoseb Park, Jin-Seong E-mail: jsparklime@hanyang.ac.kr; Chung, Kwun-Bum E-mail: jsparklime@hanyang.ac.kr

    2013-11-18

    Tantalum (Ta) is suggested to act as an electron donor and crystal phase stabilizer in titanium oxide (TiO{sub x}). A transition occurs from an amorphous state to a crystalline phase at an annealing temperature above 300 °C in a vacuum ambient. As the annealing temperature increases from 300 °C to 450 °C, the mobility increases drastically from 0.07 cm{sup 2}/Vs to 0.61 cm{sup 2}/Vs. The remarkable enhancement of thin film transistor performance is suggested to be due to the splitting of Ti 3d band orbitals as well as the increase in Ta{sup 5+} ions that can act as electron donors.

  18. Symmetry dependent optoelectronic properties of grain boundaries in polycrystalline Cu(In,Ga)Se{sub 2} thin films

    SciTech Connect

    Müller, Mathias; Bertram, Frank; Christen, Jürgen; Abou-Ras, Daniel Rissom, Thorsten

    2014-01-14

    In a correlative study applying electron backscatter diffraction as well as spatially and spectrally resolved cathodoluminescence spectroscopy at low temperatures of about 5 K, the symmetry-dependent optoelectronic properties of grain boundaries in Cu(In,Ga)Se{sub 2} thin films have been investigated. We find that grain boundaries with lower symmetries tend to show a distinct spectral red shift of about 10 meV and a weak influence on the emission intensity. These behaviors are not detected at high-symmetry Σ3 grain boundaries, or at least in a strongly reduced way. The investigations in the present work help to clarify the ambivalent properties reported for grain boundaries in Cu(In,Ga)Se{sub 2}.

  19. Hysteresis in single and polycrystalline iron thin films: Major and minor loops, first order reversal curves, and Preisach modeling

    NASA Astrophysics Data System (ADS)

    Cao, Yue; Xu, Ke; Jiang, Weilin; Droubay, Timothy; Ramuhalli, Pradeep; Edwards, Danny; Johnson, Bradley R.; McCloy, John

    2015-12-01

    Hysteretic behavior was studied in a series of Fe thin films, grown by molecular beam epitaxy, having different grain sizes and grown on different substrates. Major and minor loops and first order reversal curves (FORCs) were collected to investigate magnetization mechanisms and domain behavior under different magnetic histories. The minor loop coefficient and major loop coercivity increase with decreasing grain size due to higher defect concentration resisting domain wall movement. First order reversal curves allowed estimation of the contribution of irreversible and reversible susceptibilities and switching field distribution. The differences in shape of the major loops and first order reversal curves are described using a classical Preisach model with distributions of hysterons of different switching fields, providing a powerful visualization tool to help understand the magnetization switching behavior of Fe films as manifested in various experimental magnetization measurements.

  20. Surface Modification of Polycrystalline Cu(In,Ga)Se2 Thin-Film Solar Cell Absorber Surfaces for PEEM Measurements

    SciTech Connect

    Wilks, R. G.; Contreras, M. A.; Lehmann, S.; Herrero-Albillos, J.; Bismaths, L. T.; Kronast, F.; Noufi, R.; Bar, M.

    2011-01-01

    We present a thorough examination of the {micro}m-scale topography of Cu(In, Ga)Se{sub 2} ('CIGSe') thin-film solar cell absorbers using different microscopy techniques. We specifically focus on the efficacy of preparing smooth sample surfaces - by etching in aqueous bromine solution - for a spatially resolved study of their chemical and electronic structures using photoelectron emission microscopy (PEEM). The etching procedure is shown to reduce the CIGSe surface roughness from ca. 40 to 25 nm after 40s etching, resulting in an increase in the quality of the obtained PEEM images. Furthermore we find that the average observed grain size at the etched surfaces appears larger than at the unetched surfaces. Using a liftoff procedure, it is additionally shown that the backside of the absorber is flat but finely patterned, likely due to being grown on the finely-structured Mo back contact.

  1. Perpendicular Magnetic Anisotropy in Amorphous Ferromagnetic CoSiB/Pd Thin-Film Layered Structures.

    PubMed

    Jung, Sol; Yim, Haein

    2015-10-01

    Spin transfer torque (STT) induced switching of magnetization has led to intriguing and practical possibilities for magnetic random access memory (MRAM). This form of memory, called STT-MRAM, is a strong candidate for future memory applications. This application usually requires a large perpendicular magnetic anisotropy (PMA), large coercivity, and low saturation magnetization. Therefore, we propose an amorphous ferromagnetic CoSiB alloy and investigate CoSiB/Pd multilayer thin films, which have a large PMA, large coercivity, and low saturation magnetization. In this research, we propose a remarkable layered structure that could be a candidate for future applications and try to address a few factors that might affect the variation of PMA, coercivity, and saturation magnetization in the CoSiB/Pd multilayers. We investigate the magnetic properties of the CoSiB/Pd multilayers with various thicknesses of the CoSiB layer. The coercivity was obtained with a maximum of 228 Oe and a minimum value of 91 Oe in the [CoSiB 7 Å/Pd 14 Å], and [CoSiB 9 Å/Pd 14 Å], multilayers, respectively. The PMA arises from tCoSiB = 3 Å to tCoSiB = 9 Å and disappears after tCoSiB = 9 Å.

  2. Ion-assisted laser deposition of intermediate layers for YBa{sub 2}Cu{sub 3}O{sub 7-{delta}} thin film growth on polycrystalline and amorphous substrates

    SciTech Connect

    Reade, R.P.

    1993-11-01

    The growth of YBa{sub 2}Cu{sub 3}O{sub 7-{delta}} (YBCO) high-temperature superconductor thin films has largely been limited to deposition on single-crystal substrates to date. In order to expand the range of potential applications, growth on polycrystalline and amorphous substrates is desirable. In particular, the deposition of YBCO thin films with high critical current densities on polycrystalline metal alloys would allow the manufacture of superconducting tapes. However, it is shown that it is not possible to grow YBCO thin films directly on this type of substrate due to chemical and structural incompatibility. This work investigates the use of a yttria-stabilized zirconia (YSZ) intermediate layer to address this problem. An ion-assisted pulsed-laser deposition process is developed to provide control of orientation during the growth of the YSZ layers. The important properties of YBCO and YSZ are summarized and the status of research on thin film growth of these materials is reviewed. An overview of the pulsed-laser deposition (PLD) technique is presented. The use of ion-assisted deposition techniques to control thin film properties is discussed.

  3. Optoelectronic characterization of wide-bandgap (AgCu)(InGa)Se 2 thin-film polycrystalline solar cells including the role of the intrinsic zinc oxide layer

    NASA Astrophysics Data System (ADS)

    Obahiagbon, Uwadiae

    Experiments and simulations were conducted to vary the thickness and the sheet resistance of the high resistance (HR) ZnO layer in polycrystalline thin film (AgCu)(GaIn)Se2 (ACIGS) solar cells. The effect of varying these parameters on the electric field distribution, depletion width and hence capacitance were studied by SCAPS simulation. Devices were then fabricated and characterized by a number of optoelectronic techniques. Thin film CIGS has received a lot of attention, for its use as an absorber layer for thin film solar cells. However, the addition of Silver (Ag) to the CIGS alloy system increases the band gap as indicated from optical transmission measurements and thus higher open circuit voltage (Voc) could be obtained. Furthermore, addition of Ag lowers the melting temperature of the alloy and it is expected that this lowers the defect densities in the absorber and thus leads to higher performance. Transient photocapacitance analysis on ACIGS devices shows sharper band edge indicating lower disorder than CIGS. Presently there is a lack of fundamental knowledge relating film characteristics to device properties and performance. This is due to the fact that some features in the present solar cell structure have been optimized empirically. The goal of this research effort was to develop a fundamental and detailed understanding of the device operation as well as the loss mechanism(s) limiting these devices. Recombination mechanisms in finished ACIGS solar cell devices was studied using advanced admittance techniques (AS, DLCP, CV) to identify electronically active defect state(s) and to study their impact on electronic properties and device performance. Analysis of various optoelectronic measurements of ACIGS solar cells provided useful feedback regarding the impact on device performance of the HR ZnO layer. It was found that thickness between 10-100 nm had negligible impact on performance but reducing the thickness to 0 nm resulted in huge variability in all

  4. Measurement of Transient Tool Internal Temperature Fields by Novel Micro Thin Film Sensors Embedded in Polycrystalline Cubic Boron Nitride Cutting Inserts

    NASA Astrophysics Data System (ADS)

    Werschmoeller, Dirk

    Monitoring and control of thermomechanical phenomena in tooling are imperative for advancing fundamental understanding, enhancing reliability, and improving workpiece quality in material removal processes. Polycrystalline cubic boron nitride (PCBN) tools are being used heavily in numerous machining processes, e.g., machining of hardened low carbon steel and superalloys. These processes are very sensitive to variations in local cutting conditions at, or close to, the tool-workpiece interface, but lack a thorough understanding of fundamental transient thermo-mechanical phenomena present. As a result, abrupt catastrophic tool failures and degraded machined surfaces frequently occur. Existing sensors are not suitable for process control and monitoring, as they are either destructively embedded and/or do not possess the necessary spatial and temporal resolution to provide relevant data during machining. This research presents a novel approach for obtaining thermomechanical data from the close vicinity (i.e., 10s of micrometers) of the tool-workpiece interface. Arrays of micro thin film thermocouples with junction size 5 x 5 mum were fabricated by standard microfabrication methods and have been successfully embedded into PCBN using diffusion bonding. Electron microscopy and X-ray spectroscopy were employed to examine material interactions at the bonding interface and to determine optimal bonding parameters. Static and dynamic sensor performances have been characterized. The sensors exhibit excellent linearity up to 1300 °C, fast rise time of 150 ns, and possess good sensitivity. The inserts instrumented with embedded thin film C-type thermocouples were successfully applied to measure internal tool temperatures as close as 70 mum to the cutting edge while machining aluminum and hardened steel workpieces at industrially relevant cutting parameters. Acquired temperature data follow theoretical trends very well. Correlations between temperature and cutting parameters have

  5. The structural, optical, and electrical properties of vacuum evaporated Cu-doped ZnTe polycrystalline thin films

    NASA Astrophysics Data System (ADS)

    Feng, L.; Mao, D.; Tang, J.; Collins, R. T.; Trefny, J. U.

    1996-09-01

    We have studied the structural, optical, and electrical properties of thermally evaporated, Cu-doped, ZnTe thin films as a function of Cu concentration and post-deposition annealing temperature. X-ray diffraction measurements showed that the ZnTe films evaporated on room temperature substrates were characterized by an average grain size of 300Å with a (111) preferred orientation. Optical absorption measurements yielded a bandgap of 2.21 eV for undoped ZnTe. A bandgap shrinkage was observed for the Cu-doped films. The dark resistivity of the as-deposited ZnTe decreased by more than three orders of magnitude as the Cu concentration was increased from 4 to 8 at.% and decreased to less than 1 ohm-cm after annealing at 260°C. For films doped with 6 7 at.% Cu, an increase of resistivity was also observed during annealing at 150 200°C. The activation energy of the dark conductivity was measured as a function of Cu concentration and annealing temperature. Hall measurements yielded hole mobility values in the range between 0.1 and 1 cm2/V·s for both as-deposited and annealed films. Solar cells with a CdS/CdTe/ZnTe/metal structure were fabricated using Cudoped ZnTe as a back contact layer on electrodeposited CdTe. Fill factors approaching 0.75 and energy conversion efficiencies as high as 12.1% were obtained.

  6. Photoinduced current transient spectroscopy technique applied to the study of point defects in polycrystalline CdS thin films

    NASA Astrophysics Data System (ADS)

    El Akkad, Fikry; Ashour, Habib

    2009-05-01

    CdS thin films of variable thickness (between 160 and 1200 nm) were prepared using rf magnetron sputtering. X-ray diffraction measurements showed that the films have hexagonal structure and that the crystallites are preferentially oriented with the ⟨002⟩ axis perpendicular to the substrate surface. The results of electrical conductivity measurements as a function of film thickness and of temperature provide evidence that the conductivity is controlled by a thermally activated mobility in the presence of an intergrain barrier. The room temperature barrier height ϕ decreases with the increase in film thickness. Values of ϕ between 0 and 0.25 eV were determined. Photoinduced current transient spectroscopy performed on five samples having different thicknesses showed the presence of 11 traps with activation energies in the range 0.08-1.06 eV; deeper traps being observed on thinner films. By comparison with literature results, seven traps are attributed to native defects and foreign impurities (mainly Cu, Au, and Ag). Four other traps, not previously observed, are attributed to residual defects. The observation that deeper traps are detected in samples with larger barrier heights has been discussed and interpreted in terms of the energy band profile near the grain boundary.

  7. Investigations of ultra-thin single layer a-Si:H films

    SciTech Connect

    Koehler, S.A.

    1997-07-01

    Measurements are presented as direct evidence of tail states in ultra-thin a-Si:H single layer films. Including tail states in computer simulations completely removes the staircase structure in the differential optical spectra, previously associated with the quantum confinement of carriers.

  8. Conformal Thin Film Packaging for SiC Sensor Circuits in Harsh Environments

    NASA Technical Reports Server (NTRS)

    Scardelletti, Maximilian C.; Karnick, David A.; Ponchak, George E.; Zorman, Christian A.

    2011-01-01

    In this investigation sputtered silicon carbide annealed at 300 C for one hour is used as a conformal thin film package. A RF magnetron sputterer was used to deposit 500 nm silicon carbide films on gold metal structures on alumina wafers. To determine the reliability and resistance to immersion in harsh environments, samples were submerged in gold etchant for 24 hours, in BOE for 24 hours, and in an O2 plasma etch for one hour. The adhesion strength of the thin film was measured by a pull test before and after the chemical immersion, which indicated that the film has an adhesion strength better than 10(exp 8) N/m2; this is similar to the adhesion of the gold layer to the alumina wafer. MIM capacitors are used to determine the dielectric constant, which is dependent on the SiC anneal temperature. Finally, to demonstrate that the SiC, conformal, thin film may be used to package RF circuits and sensors, an LC resonator circuit was fabricated and tested with and without the conformal SiC thin film packaging. The results indicate that the SiC coating adds no appreciable degradation to the circuits RF performance. Index Terms Sputter, silicon carbide, MIM capacitors, LC resonators, gold etchants, BOE, O2 plasma

  9. Polycrystalline semiconductor processing

    DOEpatents

    Glaeser, Andreas M.; Haggerty, John S.; Danforth, Stephen C.

    1983-01-01

    A process for forming large-grain polycrystalline films from amorphous films for use as photovoltaic devices. The process operates on the amorphous film and uses the driving force inherent to the transition from the amorphous state to the crystalline state as the force which drives the grain growth process. The resultant polycrystalline film is characterized by a grain size that is greater than the thickness of the film. A thin amorphous film is deposited on a substrate. The formation of a plurality of crystalline embryos is induced in the amorphous film at predetermined spaced apart locations and nucleation is inhibited elsewhere in the film. The crystalline embryos are caused to grow in the amorphous film, without further nucleation occurring in the film, until the growth of the embryos is halted by imgingement on adjacently growing embryos. The process is applicable to both batch and continuous processing techniques. In either type of process, the thin amorphous film is sequentially doped with p and n type dopants. Doping is effected either before or after the formation and growth of the crystalline embryos in the amorphous film, or during a continuously proceeding crystallization step.

  10. Polycrystalline semiconductor processing

    DOEpatents

    Glaeser, A.M.; Haggerty, J.S.; Danforth, S.C.

    1983-04-05

    A process is described for forming large-grain polycrystalline films from amorphous films for use as photovoltaic devices. The process operates on the amorphous film and uses the driving force inherent to the transition from the amorphous state to the crystalline state as the force which drives the grain growth process. The resultant polycrystalline film is characterized by a grain size that is greater than the thickness of the film. A thin amorphous film is deposited on a substrate. The formation of a plurality of crystalline embryos is induced in the amorphous film at predetermined spaced apart locations and nucleation is inhibited elsewhere in the film. The crystalline embryos are caused to grow in the amorphous film, without further nucleation occurring in the film, until the growth of the embryos is halted by impingement on adjacently growing embryos. The process is applicable to both batch and continuous processing techniques. In either type of process, the thin amorphous film is sequentially doped with p and n type dopants. Doping is effected either before or after the formation and growth of the crystalline embryos in the amorphous film, or during a continuously proceeding crystallization step. 10 figs.

  11. Combinatorial investigation of the effects of sodium on Cu 2ZnSnSe4 polycrystalline thin films

    NASA Astrophysics Data System (ADS)

    Gibbs, Alex Hilton

    Cu2ZnSnSe4 (CZTSe) possess highly suitable optical and electronic properties for use as an absorber layer in thin film solar cells. CZTSe also has potential to achieve terawatt level solar energy production due to its inexpensive and abundant material constituents. Currently, fabricating CZTSe devices with the expected theoretical performance has not been achieved, making the growth and formation of CZTSe an interesting topic of research. In this work, a two-step vacuum fabrication process consisting of RF co-sputtering followed by reactive annealing was explored as a viable technique for synthesizing CZTSe thin films. Furthermore, the enhancement of the fabrication process by the incorporation of sodium during annealing was studied using a combinatorial approach. Film composition was analyzed using electron dispersive spectroscopy. Structure, phase morphology, and formation were determined using scanning electron microscopy, x-ray diffraction, atomic force microscopy and raman spectroscopy. Optical and electronic properties were characterized using UV-Vis and Voc were measurements under a one sun solar simulator. RF co-sputtering CuSe, ZnSe, and SnSe precursors produced films with good thickness uniformity, adhesion and stoichiometry control over 3 x 3 in 2 substrates. Composition measurements showed that the precursor films maintained stability during an annealing process of 580° C for 20 minutes producing near stoichiometric CZTSe. However, grain size was small with an average diameter of 350 nm. The CZTSe film produced by this process exhibited a suitable absorption coefficient of > 104 cm-1 and aband gap near 1.0 eV. The film also produced an XRD pattern consistent with tetragonal CZTSe with no secondary phase formation with the exception of approximately 12.5 nm of interfacial MoSe2 formation at the back contact. The combinatorial investigation of the influence of sodium on CZTSe growth and morphology was achieved using a custom built constant withdraw

  12. Photovoltaic performance of Gallium-doped ZnO thin film/Si nanowires heterojunction diodes

    NASA Astrophysics Data System (ADS)

    Akgul, Guvenc; Aksoy Akgul, Funda; Emrah Unalan, Husnu; Turan, Rasit

    2016-04-01

    In this work, photovoltaic performance of Ga-doped ZnO thin film/Si NWs heterojunction diodes was investigated. Highly dense and vertically well-aligned Si NW arrays were successfully synthesised on a p-type (1 0 0)-oriented Si wafer through cost-effective metal-assisted chemical etching technique. Ga-doped ZnO thin films were deposited onto Si NWs via radio frequency magnetron sputtering to construct three-dimensional heterostructures. Photovoltaic characteristics of the fabricated diodes were determined with current density (J)-voltage (V) measurements under simulated solar irradiation of AM 1.5 G. The optimal open-circuit voltage, short-circuit current density, fill factor and power conversion efficiency were found to be 0.37 V, 3.30 mA cm-2, 39.00 and 0.62%, respectively. Moreover, photovoltaic diodes exhibited relatively high external quantum efficiency over the broadband wavelengths between 350 and 1100 nm interval of the spectrum. The observed photovoltaic performance in this study clearly indicates that the investigated device structure composed of Ga-doped ZnO thin film/Si NWs heterojunctions could facilitate an alternative pathway for optoelectronic applications in future, and be a promising alternative candidate for high-performance low-cost new-generation photovoltaic diodes.

  13. Comparison of the annealing behavior of thin Ta films deposited onto Si and SiO2 substrates.

    PubMed

    Hübner, R; Hecker, M; Mattern, N; Hoffmann, V; Wetzig, K; Engelmann, H-J; Zschech, E

    2004-06-01

    Structural changes at annealing temperatures (T(an)) of 500-1,100 degrees C were investigated for thin Ta films which were sputter-deposited onto pure Si substrates and onto thermally oxidized Si. In the as-deposited state, the Ta layers predominantly consist of metastable tetragonal beta-Ta, whereby the [001] texture is independent of the substrate material. At lower annealing temperatures, the microstructural evolution is essentially the same for both Ta films. Incorporation of O atoms causes an increase of the intrinsic compressive stress, and diffusion of C atoms into the Ta layer leads to the formation of Ta(2)C. Additionally, a partial transformation of the original beta-Ta phase into a second phase with tetragonal unit cell (denoted as beta'-Ta) occurs. For the Ta/Si system, the formation of a Ta-Si intermixing layer is initiated at T(an)=550 degrees C, and nucleation of crystalline TaSi(2) occurs at T(an)=620 degrees C. The formation of a second Ta silicide was not detected up to T(an)=900 degrees C. In the case of the Ta film deposited onto the SiO(2) substrate, the metastable beta-Ta and the beta'-Ta transform completely into the thermodynamically stable cubic alpha-Ta at T(an)=750 degrees C. A marked reaction with the substrate indicated by the formation of Ta(2)O(5) and Ta(5)Si(3) occurs at T(an)=1,000 degrees C.

  14. Thin films of SiO2 and hydroxyapatite on titanium deposited by spray pyrolysis.

    PubMed

    Jokanovic, V; Jokanovic, B; Izvonar, D; Dacic, B

    2008-05-01

    Wet spray pyrolysis of fine, well-dispersed a SiO2 sol was used for the deposition of thin films of silicon dioxide. The sol was obtained by hydrothermal precipitation of silicon acid from a solution at pH = 10. The morphology, roughness, phase composition, chemical homogeneity and the mechanism of the films were investigated by SEM, EDS and IR spectroscopy. The obtained results show a complete covering of the titanium substrate with SiO2 after 3 h of deposition. It was observed that the film thickness increased from 3 to 19 microm, the roughness of the film decreased from 12 to 3 microm, while the morphology of the deposit changed considerably. A hydroxyapatite film was prepared on the so-obtained SiO2 thin film by spray pyrolysis deposition and its morphology and phase composition were investigated.

  15. Growth of YBa sub 2 Cu sub 3 O sub 7 minus x thin films on Si with a CoSi sub 2 buffer layer

    SciTech Connect

    Luo, L.; Muenchausen, R.E.; Maggiore, C.J. ); Jimenez, J.R.; Schowalter, L.J. )

    1991-01-28

    By using the pulsed laser deposition technique, high-temperature superconducting YBa{sub 2}Cu{sub 3}O{sub 7{minus}{ital x}} (YBCO) films were grown on Si(001) with a 36 nm single-crystal {l angle}001{r angle} oriented CoSi{sub 2} buffer layer. The films, grown at a substrate temperature of {similar to}700 {degree}C, have a metallic resistive temperature dependence with zero resistance at 85 K. X-ray diffraction, scanning electron microscopy, and ion channeling studies show that the YBCO films are polycrystalline but are strongly {ital c}-axis oriented normal to the Si substrate. Diffusion at the interface between the YBCO film and silicide buffer layer was minimized. This is essential to the growth of high-temperature superconducting films on Si substrates.

  16. Investigation of solar cell performance using multilayer thin film structure (SiO2/Si3N4) and grating

    NASA Astrophysics Data System (ADS)

    Dubey, R. S.; Jhansirani, K.; Singh, Shyam

    Thin film silicon solar cells are the better choice due to their low cost as compared to the crystalline solar cells. However, thin film silicon solar cells are suffering from a problem of weak absorption of incident light and hence, light trapping mechanism is essential for the harvesting of maximum solar radiation. In this paper, we present the performance of solar cell using an efficient back reflector composed of multilayer thin film (SiO2/Si3N4) and a diffraction grating. The use of a back reflector showed enhanced light absorption due to the folding of unabsorbed light coming to it after crossing the active region in a wide wavelength range. Further, the effect of active layer thickness and grating height were also discussed for the optimal performance of the solar cell. In the case of magnetic transverse mode, a relative enhancement in cell efficiency about 79 and 21% respectively have been observed with respect to a planar and SC4 solar cells.

  17. Self-consistent modelling of X-ray photoelectron spectra from air-exposed polycrystalline TiN thin films

    NASA Astrophysics Data System (ADS)

    Greczynski, G.; Hultman, L.

    2016-11-01

    We present first self-consistent modelling of x-ray photoelectron spectroscopy (XPS) Ti 2p, N 1s, O 1s, and C 1s core level spectra with a cross-peak quantitative agreement for a series of TiN thin films grown by dc magnetron sputtering and oxidized to different extent by varying the venting temperature Tv of the vacuum chamber before removing the deposited samples. So-obtained film series constitute a model case for XPS application studies, where certain degree of atmosphere exposure during sample transfer to the XPS instrument is unavoidable. The challenge is to extract information about surface chemistry without invoking destructive pre-cleaning with noble gas ions. All TiN surfaces are thus analyzed in the as-received state by XPS using monochromatic Al Kα radiation (hν = 1486.6 eV). Details of line shapes and relative peak areas obtained from deconvolution of the reference Ti 2p and N 1 s spectra representative of a native TiN surface serve as an input to model complex core level signals from air-exposed surfaces, where contributions from oxides and oxynitrides make the task very challenging considering the influence of the whole deposition process at hand. The essential part of the presented approach is that the deconvolution process is not only guided by the comparison to the reference binding energy values that often show large spread, but in order to increase reliability of the extracted chemical information the requirement for both qualitative and quantitative self-consistency between component peaks belonging to the same chemical species is imposed across all core-level spectra (including often neglected O 1s and C 1s signals). The relative ratios between contributions from different chemical species vary as a function of Tv presenting a self-consistency check for our model. We propose that the cross-peak self-consistency should be a prerequisite for reliable XPS peak modelling as it enhances credibility of obtained chemical information, while relying

  18. H2-Ar dilution for improved c-Si quantum dots in P-doped SiNx:H thin film matrix

    NASA Astrophysics Data System (ADS)

    Liu, Jia; Zhang, Weijia; Liu, Shengzhong (Frank)

    2017-02-01

    Phosphorus-doped hydrogenated silicon nitride (SiNx:H) thin films containing crystalline silicon quantum dot (c-Si QD) was prepared by plasma enhanced chemical vapor deposition (PECVD) using hydrogen-argon mixed dilution. The effects of H2/Ar flow ratio on the structural, electrical and optical characteristics of as-grown P-doped SiNx:H thin films were systematically investigated. Experimental results show that crystallization is promoted by increasing the H2/Ar flow ratio in dilution, while the N/Si atomic ratio is higher for thin film deposited with argon-rich dilution. As the H2/Ar flow ratio varies from 100/100 to 200/0, the samples exhibit excellent conductivity owing to the large volume fraction of c-Si QDs and effective P-doping. By adjusting the H2/Ar ratio to 100/100, P-doped SiNx:H thin film containing tiny and densely distributed c-Si QDs can be obtained. It simultaneously possesses wide optical band gap and high dark conductivity. Finally, detailed discussion has been made to analyze the influence of H2-Ar mixed dilution on the properties of P-doped SiNx:H thin films.

  19. Elaboration and characterization of luminescent porous SiC microparticles/poly vinyl alcohol thin films

    NASA Astrophysics Data System (ADS)

    Kaci, S.; Mansouri, H.; Bozetine, I.; Keffous, A.; Guerbous, L.; Siahmed, Y.; Aissiou, S.

    2017-02-01

    In this study, Morphological, optical and photoluminescence characterizations of nanostructured SiC micropowder embedded in PVA matrix and deposited as thin films on glass substrates are reported. we prepared the porous SiC microparticles/PVA thin films by spin coating method. The average size of SiC microparticles were 7 μm. An electroless method was used for producing porous silicon carbide powder under UV irradiation. Silver nanoparticles coated SiC powder was formed by polyol process. The etchant was composed of aqueous HF and different oxidants. Various porous morphologies were obtained and studied as a function of oxidant type, etching time, and wavelength of irradiation. We concluded that the chemical etching conditions of SiC powder seems to have a large impact on the resulting properties. We noticed that the best photoluminescence property was achieved when SiC powder was etched in HF/K2S2O8 at reaction temperature of 80 °C for t = 40min and under UV light of 254 nm.

  20. Low temperature Ti-Si-C thin film deposition by ion beam assisted methods

    NASA Astrophysics Data System (ADS)

    Twardowska, Agnieszka; Rajchel, Boguslaw; Jaworska, Lucyna

    2010-11-01

    Thin, multiphase Ti-Si-C coatings were formed by IBSD or by IBAD methods on AISI 316L steel substrates in room temperature, using single Ti3SiC2 target. In those methods the TiXSiCY coatings were formed from the flux of energetic atoms and ions obtained by ion sputtering of the Ti3SiC2 compound sample. As sputtering beam the beam of Ar+ ions at energy of 15keV was applied. In the IBAD method the dynamically formed coatings were additionally bombarded by beam of Ar+ ions at energy of 15keV. The ion beams parameters were obtained by using Monte Carlo computer simulations. The morphology (SEM, TEM), chemical (EDS/EDX) and phase composition (XRD) examinations of formed coatings were provided as well as confocal Raman microspectroscopy. Analyzed coatings were relatively thin (150nm-1μm), flat and dense. XRD analysis indicated in amorphous TiSi, the traces of Ti5Si3 and other phases from Ti-Si-C system (TiSi, TiSi2,Ti3SiC2). For chemical bonds investigation, the laser beam with length of 532nm was used. Those analyses were performed in the low (LR) or in high (HR) resolution modes in room temperature and in 4000C. In the HR mode the spectral resolution was close to 2 cm-1. In Raman spectra peaks at: 152cm-1, 216cm-1, 278cm-1, 311 cm-1, 608cm-1, 691cm-1 were recorded. Nanoindentation tests were done on coated and uncoated substrates with diamond, Berkovich-type indenter. Vickers hardness HIT and reduced elastic modulus EIT were calculated using Olivier& Pharr method. HIT for coated substrates was in the range 2.7 to 5.3 GPa, EIT was 160 GPa.

  1. Optimal design of light trapping in thin-film solar cells enhanced with graded SiNx and SiOxNy structure.

    PubMed

    Zhao, Yongxiang; Chen, Fei; Shen, Qiang; Zhang, Lianmeng

    2012-05-07

    In this paper, a graded SiNx and SiOxNy structure is proposed as antireflection coatings deposited on top of amorphous silicon (α-Si) thin-film solar cell. The structural parameters are optimized by differential evolution in order to enhance the optical absorption of solar cells to the greatest degree. The optimal design result demonstrates that the nonlinear profile of dielectric constant is superior to the linear profile, and discrete multilayer graded antireflection coatings can outperform near continuously graded antireflection coatings. What's more, the electric field intensity distributions clearly demonstrate the proposed graded SiNx and SiOxNy structure can remarkably increase the magnitude of electric field of a-Si:H layer and hence, enhance the light trapping of a-Si:H thin-film solar cells in the whole visible and near-infrared spectrum. Finally, we have compared the optical absorption enhancements of proposed graded SiNx and SiOxNy structure with nanoparticles structure, and demonstrated that it can result in higher enhancements compared to the dielectric SiC and TiO2 nanoparticles. We have shown that the optimal graded SiNx and SiOxNy structure optimized by differential evolution can reach 33.31% enhancement which has exceeded the ideal limit of 32% of nanoparticles structure including plasmonic Ag nanoparticles, dielectric SiC and TiO2 nanoparticles.

  2. Bi4Si3O12 thin films for scintillator applications

    NASA Astrophysics Data System (ADS)

    Rincón-López, J. A.; Fernández-Benavides, D. A.; Giraldo-Betancur, A. L.; Cruz-Muñoz, B.; Riascos, H.; Muñoz-Saldaña, J.

    2016-04-01

    Bismuth silicate Bi4Si3O12 or BSO thin films were synthesized by pulsed laser deposition and a subsequent annealing treatment from a Bi-Fe-O and compared with films obtained with a pure Bi2O3 target. Bi-Fe-O amorphous thin films of different thicknesses were deposited on silicon substrates at room temperature and subsequently heat treated at 800 °C at different times to study the phase transformations, keeping in all steps a constant oxygen atmosphere. After annealing, Bi-Si-O crystalline phases are formed in all cases with different synthesis kinetics. The Bi-Fe-O target clearly increases the synthesis kinetic of a textured BSO phase having a dissociation and precipitation of homogeneously distributed Fe2O3 particles in the BSO matrix. The key aspects to obtain the Bi4Si3O12 stoichiometric phase are both the film thickness and the heat treatment time to allow the reaction between the Bi2O3 from the target and the SiO2 obtained after the oxidation of the substrate. A deposition time of Bi-Fe-O for 120 and 30 min annealing fulfills the conditions to obtain the Bi4Si3O12 stoichiometric composition and thus scintillation performance. The scintillation properties were measured by a fluorescence spectrophotometry. The stoichiometric Bi4Si3O12 samples show that under 260 nm excitation the material exhibits a peak emission at 466.6 nm. These Bi4Si3O12 thin films crystallize in eulytite phase with cubic structure (a = b = c = 10.291 Å). The phase content was obtained by Rietveld analysis of X-ray diffraction patterns.

  3. Bondability of Al-Si thin film in thermosonic gold wire bonding. [integrated circuits

    NASA Technical Reports Server (NTRS)

    Nakagawa, K.; Miyata, K.; Banjo, T.; Shimada, W.

    1985-01-01

    The bondability of two kinds of Al-Si thin films in thermosonic Au wire bonding was examined by means of microshear tests. One type of film was formed by sputtering an Al-2% Si alloy, and the other was formed by depositing an 0.05 micrometer-thick polysilicon layer on SiO2 by chemical vapor deposition (CVD) and then depositing a 1.2 micrometer-thick Al layer on them by evaporation. After heat-treatment at 450 deg for 30 min., Si in the Al-Si film crystallized. The grain size of the crystallized Si affects the thermosonic wire bondability, i.e., for Al-2% Si sputtered films, good bondability was obtained under relatively small (1.0 micrometer) grain size conditions. In the successive layer process, on the other hand, the grain size of crystallized Si varies with the polysilicon CVD temperature. The optimum CVD temp. was determined from the standpoint of bondability with respect to grain size.

  4. Co{sub 2}FeAl Heusler thin films grown on Si and MgO substrates: Annealing temperature effect

    SciTech Connect

    Belmeguenai, M. Tuzcuoglu, H.; Zighem, F.; Chérif, S. M.; Moch, P.; Gabor, M. S. Petrisor, T.; Tiusan, C.

    2014-01-28

    10 nm and 50 nm Co{sub 2}FeAl (CFA) thin films have been deposited on MgO(001) and Si(001) substrates by magnetron sputtering and annealed at different temperatures. X-rays diffraction revealed polycrystalline or epitaxial growth (according to CFA(001)[110]//MgO(001)[100] epitaxial relation) for CFA films grown on a Si and on a MgO substrate, respectively. For these later, the chemical order varies from the A2 phase to the B2 phase when increasing the annealing temperature (T{sub a}), while only the A2 disorder type has been observed for CFA grown on Si. Microstrip ferromagnetic resonance (MS-FMR) measurements revealed that the in-plane anisotropy results from the superposition of a uniaxial and a fourfold symmetry term for CFA grown on MgO substrates. This fourfold anisotropy, which disappears completely for samples grown on Si, is in accord with the crystal structure of the samples. The fourfold anisotropy field decreases when increasing T{sub a}, while the uniaxial anisotropy field is nearly unaffected by T{sub a} within the investigated range. The MS-FMR data also allow for concluding that the gyromagnetic factor remains constant and that the exchange stiffness constant increases with T{sub a}. Finally, the FMR linewidth decreases when increasing T{sub a}, due to the enhancement of the chemical order. We derive a very low intrinsic damping parameter (1.1×10{sup −3} and 1.3×10{sup −3} for films of 50 nm thickness annealed at 615 °C grown on MgO and on Si, respectively)

  5. Tin induced a-Si crystallization in thin films of Si-Sn alloys

    SciTech Connect

    Neimash, V. E-mail: oleks.goushcha@nuportsoft.com; Poroshin, V.; Goushcha, A. O. E-mail: oleks.goushcha@nuportsoft.com; Shepeliavyi, P.; Yukhymchuk, V.; Melnyk, V.; Kuzmich, A.; Makara, V.

    2013-12-07

    Effects of tin doping on crystallization of amorphous silicon were studied using Raman scattering, Auger spectroscopy, scanning electron microscopy, and X-ray fluorescence techniques. Formation of silicon nanocrystals (2–4 nm in size) in the amorphous matrix of Si{sub 1−x}Sn{sub x}, obtained by physical vapor deposition of the components in vacuum, was observed at temperatures around 300 °C. The aggregate volume of nanocrystals in the deposited film of Si{sub 1−x}Sn{sub x} exceeded 60% of the total film volume and correlated well with the tin content. Formation of structures with ∼80% partial volume of the nanocrystalline phase was also demonstrated. Tin-induced crystallization of amorphous silicon occurred only around the clusters of metallic tin, which suggested the crystallization mechanism involving an interfacial molten Si:Sn layer.

  6. Influence of the preparation conditions on the morphology of perylene thin films on Si(111) and Si(100)

    SciTech Connect

    Casu, M. B.; Yu, X.; Schmitt, S.; Heske, C.; Umbach, E.

    2008-12-28

    Thin films of perylene on Si(111) and Si(100) substrates have been investigated using a variety of experimental techniques. We find that the structural and morphological properties as well as the growth modes strongly depend on the preparation parameters. In general, we observe the existence of a relatively weak coupling between perylene and the two single crystal substrates. However, under special preparation conditions, it is possible to obtain a multilayer phase on the Si(111) substrate that is characterized by flat-lying, parallel-oriented molecules, and strong coupling with the substrate in the first layer. This phase has different structural, electronic, and intermolecular bonding properties as compared to the known crystalline phases. On Si(100), by varying the deposition rate between 0.1 and 10 nm/min, it is possible to observe a transition from island growth mode, with large and isolated crystallites, to homogeneous film growth. These findings contribute to the basic knowledge for film engineering. Thus, the film morphology could be designed ranging from the growth of very large single grains suitable for a complete nanodevice to homogenous films for application in large displays.

  7. Electron microscopy study of Ni induced crystallization in amorphous Si thin films

    SciTech Connect

    Radnóczi, G. Z.; Battistig, G.; Pécz, B.; Dodony, E.; Vouroutzis, N.; Stoemenos, J.; Frangis, N.; Kovács, A.

    2015-02-17

    The crystallization of amorphous silicon is studied by transmission electron microscopy. The effect of Ni on the crystallization is studied in a wide temperature range heating thinned samples in-situ inside the microscope. Two cases of limited Ni source and unlimited Ni source are studied and compared. NiSi{sub 2} phase started to form at a temperature as low as 250°C in the limited Ni source case. In-situ observation gives a clear view on the crystallization of silicon through small NiSi{sub 2} grain formation. The same phase is observed at the crystallization front in the unlimited Ni source case, where a second region is also observed with large grains of Ni{sub 3}Si{sub 2}. Low temperature experiments show, that long annealing of amorphous silicon at 410 °C already results in large crystallized Si regions due to the Ni induced crystallization.

  8. Durability Evaluation of a Thin Film Sensor System With Enhanced Lead Wire Attachments on SiC/SiC Ceramic Matrix Composites

    NASA Technical Reports Server (NTRS)

    Lei, Jih-Fen; Kiser, J. Douglas; Singh, Mrityunjay; Cuy, Mike; Blaha, Charles A.; Androjna, Drago

    2000-01-01

    An advanced thin film sensor system instrumented on silicon carbide (SiC) fiber reinforced SiC matrix ceramic matrix composites (SiC/SiC CMCs), was evaluated in a Mach 0.3 burner rig in order to determine its durability to monitor material/component surface temperature in harsh environments. The sensor system included thermocouples in a thin film form (5 microns thick), fine lead wires (75 microns diameter), and the bonds between these wires and the thin films. Other critical components of the overall system were the heavy, swaged lead wire cable (500 microns diameter) that contained the fine lead wires and was connected to the temperature readout, and ceramic attachments which were bonded onto the CMCs for the purpose of securing the lead wire cables, The newly developed ceramic attachment features a combination of hoops made of monolithic SiC or SiC/SiC CMC (which are joined to the test article) and high temperature ceramic cement. Two instrumented CMC panels were tested in a burner rig for a total of 40 cycles to 1150 C (2100 F). A cycle consisted of rapid heating to 1150 C (2100 F), a 5 minute hold at 1150 C (2100 F), and then cooling down to room temperature in 2 minutes. The thin film sensor systems provided repeatable temperature measurements for a maximum of 25 thermal cycles. Two of the monolithic SiC hoops debonded during the sensor fabrication process and two of the SiC/SiC CMC hoops failed during testing. The hoops filled with ceramic cement, however, showed no sign of detachment after 40 thermal cycle test. The primary failure mechanism of this sensor system was the loss of the fine lead wire-to-thin film connection, which either due to detachment of the fine lead wires from the thin film thermocouples or breakage of the fine wire.

  9. Enhancement in visible luminescence from nanocomposite ZnO-SiOx thin films due to annealing

    NASA Astrophysics Data System (ADS)

    Kumar, V. V. Siva; Kanjilal, D.

    2014-01-01

    The annealing induced enhancement in visible photoluminescence (PL) from nanocomposite (nc) ZnO-SiOx thin films was investigated. Nc ZnO-SiOx thin films consisting of ZnO nanocrystals in silica matrix were grown by depositing the films using radio frequency (rf) reactive co-sputtering and post-annealing them at temperatures of 350°C and 500°C in high vacuum and air. These films were characterized by Fourier transform infrared (FTIR), (PL) spectroscopy and UV-Vis spectrophotometry measurements. Thin films were also deposited on transmission electron microscopy (TEM) grids in almost identical conditions. The TEM measurement of the thin film deposited on TEM grid shows the formation of ZnO nanocrystals with a size distribution from 3.0 nm to 6.8 nm (+/-0.2 nm) in silica matrix. The UV-Vis spectra of the films show absorption features of ZnO and Zn2SiO4 phases in the films. The visible PL emission intensity and peak width increased in the annealed films. The results suggest increase in the number and size distribution of the ZnO nanocrystals in silica matrix due to the annealing resulting in increase in visible PL emission. The results of vacuum annealed films indicate that these films can be useful in the development of wide band visible light emitting devices using this material.

  10. Study and Simulation of the Heterojunction Thin Film Solar Cell a-Si( n)/a-Si( i)/c-Si( p)/a-Si( i)/a-Si( p)

    NASA Astrophysics Data System (ADS)

    Toufik, Zarede; Hamza, Lidjici; Mohamed, Fathi; Achour, Mahrane

    2016-08-01

    In this article, we present a study based on numerical simulation of the electrical characteristics of a thin-film heterojunction solar cell (a-Si( n)/a-Si( i)/c-Si( p)/a-Si( i)/a-Si( p)), using the automat for simulation of hetero-structures (AFORS-Het) software. This cell is composed of four main layers of silicon (Si): (i) 5 nm amorphous silicon doped n, (ii) 100 μm crystalline silicon (substrate) doped p, (iii) 5 nm amorphous silicon doped p, and (iv) 3 nm amorphous silicon intrinsic. This cell has a front and rear metal contact of aluminum and zinc oxide (ZnO) front layer transparent conductive oxide of 80 nm thickness. The simulations were performed at conditions of "One Sun" irradiation with air mass 1.5 (AM1.5), and under absolute temperature T = 300 K. The simulation results have shown a high electrical conversion efficiency of about 30.29% and high values of open circuit voltage V oc = 779 mV. This study has also shown that the studied cell has good quality light absorption on a very broad spectrum.

  11. Perpendicular Magnetic Anisotropy in CoSiB/Pd/CoSiB Trilayer Thin Films with Varying Pd-Layer Thicknesses.

    PubMed

    Jung, Sol; Kim, Taewan; Yim, Haein

    2015-11-01

    We investigate the magnetic properties of CoSiB (1 5-Å-thickness)/Pd (Pd thickness = 8, 11, 14, 17, 20, 24, 27, 29 and 33 Å)/CoSiB (15-Å-thickness) trilayer thin films. The CoSiB-layer thickness was fixed to 15 Å, while the Pd-layer thickness was varied from 8-33 Å. In this paper, we present a new type of thin film containing amorphous Co75Si15B10 and Pd. We investigate the magnetic properties of a fabricated CoSiB/Pd/CoSiB trilayer thin film with perpendicular magnetic anisotropy, and determine the correlation between the magnetic properties and the nonmagnetic Pd-layer thickness. With increasing Pd-layer thickness, both the coercivity and the saturation magnetization decreased. Furthermore, the maximum values of the magnetic anisotropy were calculated as 0.3 x 10(6) erg/cc. In order to examine the difference between the in-plane magnetic anisotropy and perpendicular magnetic anisotropy, magnetic force microscopy images of the CoSiB (15-Å-thickness)/Pd (Pd thickness = 8 and 14 Å)/CoSiB (15-Å-thickness) trilayer thin films were obtained.

  12. Impacts of SiO2 planarization on optical thin film properties and laser damage resistance

    NASA Astrophysics Data System (ADS)

    Day, T.; Wang, H.; Jankowska, E.; Reagan, B. A.; Rocca, J. J.; Stolz, C. J.; Mirkarimi, P.; Folta, J.; Roehling, J.; Markosyan, A.; Route, R. R.; Fejer, M. M.; Menoni, C. S.

    2016-12-01

    Lawrence Livermore National Laboratory (LLNL) and Colorado State University (CSU) have co-developed a planarization process to smooth nodular defects. This process consists of individually depositing then etching tens of nanometers of SiO2 with a ratio of 2:1, respectively. Previous work shows incorporating the angular dependent ion surface etching and unidirectional deposition reduces substrate defect cross-sectional area by 90%. This work investigates the micro-structural and optical modifications of planarized SiO2 films deposited by ion beam sputtering (IBS). It is shown the planarized SiO2 thin films have 3x increase in absorption and 18% reduction in thin film stress as compared to control (as deposited) SiO2. Planarized SiO2 films exhibit 13% increase in RMS surface roughness with respect to the control and super polished fused silica substrates. Laser-induced damage threshold (LIDT) results indicate the planarization process has no effect on the onset fluence but alters the shape of the probability vs fluence trace.

  13. Erbium oxide thin films on Si(100) obtained by laser ablation and electron beam evaporation

    NASA Astrophysics Data System (ADS)

    Queralt, X.; Ferrater, C.; Sánchez, F.; Aguiar, R.; Palau, J.; Varela, M.

    1995-02-01

    Erbium oxide thin films have been obtained by laser ablation and electron beam evaporation techniques on Si(100) substrates. The samples were grown under different conditions of oxygen atmosphere and substrate temperature without any oxidation process after deposition. The crystal structure has been studied by X-ray diffraction. Films obtained by laser ablation are highly textured in the [ hhh] direction, although this depends on the conditions of oxygen pressure and substrate temperature. In order to study the depth composition profile of the thin films and the interdiffusion of erbium metal and oxygen towards the silicon substrates, X-ray photoelectron spectroscopy analyses have been carried out.

  14. Thermally induced Zr incorporation into Si from zirconium silicate thin films

    NASA Astrophysics Data System (ADS)

    Quevedo-Lopez, M.; El-Bouanani, M.; Addepalli, S.; Duggan, J. L.; Gnade, B. E.; Wallace, R. M.; Visokay, M. R.; Douglas, M.; Bevan, M. J.; Colombo, L.

    2001-10-01

    Monochromatic x-ray photoelectron spectroscopy, time-of-flight secondary ion mass spectrometry, and Rutherford backscattering spectrometry are used to study the outdiffusion of Zr from the alternate gate dielectric candidate ZrSixOy thin films deposited on Si(100). We find that Zr incorporation into Si from ZrSixOy appears to occur at annealing temperatures higher than 1000 °C. Incorporation of Zr to depths of up to 23 nm into the silicon substrate is observed. A diffusion coefficient of D0˜2×10-15cm2/s is estimated from the associated depth profiles.

  15. Surface roughness evolution in the growth of a-Si: H thin films studied by ellipsometry

    NASA Astrophysics Data System (ADS)

    Canillas, A.; Campmany, J.; Andújar, J. L.; Bertran, E.; Morenza, J. L.

    1991-07-01

    In situ real time ellipsometry at 3.4 eV photon energy has been used to analyze the deposition of hydrogenated amorphous silicon (a-Si:H) thin films obtained by RF glow discharge decomposition of silane gas. The study is focused on the evolution of the microstructure during the films growth. The results are explained considering a theoretical model which assumes a homogeneous growth of the a-Si:H below a surface roughness layer which increases 0.5-0.7 nm in thickness during the first 400 nm of film growth. The bulk layer microstructure appears to be homogeneous within 1% of density variations.

  16. Formation mechanisms of metallic Zn nanodots by using ZnO thin films deposited on n-Si substrates

    SciTech Connect

    Yuk, J. M.; Lee, J. Y.; Kim, Y.; No, Y. S.; Kim, T. W.; Choi, W. K.

    2010-08-09

    High-resolution transmission electron microscopy and energy dispersive x-ray spectroscopy results showed that metallic Zn nanodots (NDs) were fabricated through transformation of ZnO thin films by deposition of SiO{sub x} on ZnO/n-Si (100) heterostructures. The Zn NDs with various sizes and densities were formed due to the occurrence of the mass diffusion of atoms along the grain boundaries in the ZnO thin films. The fabrication mechanisms of metallic Zn NDs through transformation of ZnO thin films deposited on n-Si substrates are described on the basis of the experimental results.

  17. Epitaxial growth of Ti{sub 3}SiC{sub 2} thin films with basal planes parallel or orthogonal to the surface on {alpha}-SiC

    SciTech Connect

    Drevin-Bazin, A.; Barbot, J. F.; Alkazaz, M.; Cabioch, T.; Beaufort, M. F.

    2012-07-09

    The growth of Ti{sub 3}SiC{sub 2} thin films were studied onto {alpha}-SiC substrates differently oriented by thermal annealing of TiAl layers deposited by magnetron sputtering. For any substrate's orientation, transmission electron microscopy coupled with x-ray diffraction showed the coherent epitaxial growth of Ti{sub 3}SiC{sub 2} films along basal planes of SiC. Specifically for the (1120) 4H-SiC, Ti{sub 3}SiC{sub 2} basal planes are found to be orthogonal to the surface. The continuous or textured nature of Ti{sub 3}SiC{sub 2} films does not depend of the SiC stacking sequence and is explained by a step-flow mechanism of growth mode. The ohmic character of the contact was confirmed by current-voltage measurements.

  18. Structured SiCu thin films in LiB as anodes

    SciTech Connect

    Polat, Billur Deniz; Eryilmaz, Osman Levent; Erck, Robert; Keles, O.; Erdemir, A.; Amine, Khalil

    2014-09-16

    Both helical and inclined columnar Si–10 at.% Cu structured thin films were deposited on Cu substrates using glancing angle deposition (GLAD) technique. In order to deposit Cu and Si two evaporation sources were used. Ion assistance was utilized in the first 5 min of the GLAD to enhance the adhesion and the density of the films. These films were characterized by thin film XRD, GDOES, SEM, and EDS. Electrochemical characterizations were made by testing the thin films as anodes in half-cells for 100 cycles. The results showed that the columnar SiCu thin film delivered 2200 mAh g-1, where the helical one exhibited 2600 mAh g-1, and, their initial coulombic efficiencies were found to be 38%–50% respectively. For the columnar and the helical thin film anodes, sustainable 520 and 800 mAh g-1 with 90% and 99% coulombic efficiencies were achieved for 100 cycles. These sustainable capacities showed the importance of the thin film structure having nano-sized crystals and amorphous particles. The higher surface area of the helices increases the capacity of the electrode because the contact area of the thin film anode with Li ions is increased, and the polarization which otherwise forms on the anode surface due to SEI formation is decreased. In addition, because of larger interspaces between the helices the ability of the anode to accommodate the volumetric changes is improved, which results in a higher coulombic efficiency and capacity retention during cycling test.

  19. STM studies of GeSi thin layers epitaxially grown on Si(111)

    NASA Astrophysics Data System (ADS)

    Motta, N.; Sgarlata, A.; De Crescenzi, M.; Derrien, J.

    1996-08-01

    Ge/Si alloys were prepared in UHV by solid phase epitaxy on Si(111) substrates. The alloy formation, as a function of the evaporation rate and the Ge layer thickness has been followed in situ by RHEED and scanning tunneling microscopy. The 5 × 5 surface reconstruction appeared after annealing at 450°C Ge layers (up to 10 Å thick), obtained from a low rate Knudsen cell evaporator. In this case a nearly flat and uniform layer of reconstructed alloy was observed. When using an e-gun high rate evaporator we needed to anneal the Ge layer up to 780°C to obtain a 5 × 5 reconstruction. The grown layer was not flat, with many steps and Ge clusters; at high coverages (10 Å and more) large Ge islands appeared. Moreover, we then succeeded in visualizing at atomic resolution the top of some of these Ge islands which displayed a 2 × 1 reconstruction, probably induced from the high compressive strain due to the lattice mismatch with the substrate. We suggest that this unusual behavior could be connected to the high evaporation rate, which helped the direct formation of Ge microcrystals on the Si substrate during the deposition process.

  20. Progress of p-channel bottom-gate poly-Si thin-film transistor by nickel silicide seed-induced lateral crystallization

    NASA Astrophysics Data System (ADS)

    Lee, Sol Kyu; Seok, Ki Hwan; Park, Jae Hyo; Kim, Hyung Yoon; Chae, Hee Jae; Jang, Gil Su; Lee, Yong Hee; Han, Ji Su; Joo, Seung Ki

    2016-06-01

    Excimer laser annealing (ELA) is known to be the most common crystallization technology for the fabrication of low-temperature polycrystalline-silicon (poly-Si) thin-film transistors (TFTs) in the mass production industry. This technology, however, cannot be applied to bottom-gate (BG) TFTs, which are well developed for the liquid-crystal display (LCD) back-planes, because strong laser energy of ELA can seriously damage the other layers. Here, we propose a novel high-performance BG poly-Si TFT using Ni silicide seed-induced lateral crystallization (SILC). The SILC technology renders it possible to ensure low damage in the layers, smooth surface, and longitudinal large grains in the channel. It was observed that the electrical properties exhibited a steep subthreshold slope of 110 mV/dec, high field-effect mobility of 304 cm2/Vsec, high I on/ I off ratio of 5.9 × 107, and a low threshold voltage of -3.9 V.

  1. Recent advances in the transparent conducting ZnO for thin-film Si solar cells

    NASA Astrophysics Data System (ADS)

    Moon, Taeho; Shin, Gwang Su; Park, Byungwoo

    2015-11-01

    The key challenge for solar-cell development lies in the improvement of power-conversion efficiency and the reduction of fabrication cost. For thin-film Si solar cells, researches have been especially focused on the light trapping for the breakthrough in the saturated efficiencies. The ZnO-based transparent conducting oxides (TCOs) have therefore received strong attention because of their excellent light-scattering capability by the texture-etched surface and cost effectiveness through in-house fabrication. Here, we have highlighted our recent studies on the transparent conducting ZnO for thin-film Si solar cells. From the electrical properties and their degradation mechanisms, bilayer deposition and organic-acid texturing approaches for enhancing the light trapping, and finally the relation between textured ZnO and electrical cell performances are sequentially introduced in this review article. [Figure not available: see fulltext.

  2. Thermal phonon transport in Si thin film with dog-leg shaped asymmetric nanostructures

    NASA Astrophysics Data System (ADS)

    Kage, Yuta; Hagino, Harutoshi; Yanagisawa, Ryoto; Maire, Jeremie; Miyazaki, Koji; Nomura, Masahiro

    2016-08-01

    Thermal phonon transport in single-crystalline Si thin films with dog-leg shaped nanostructures was investigated. Thermal conductivities for the forward and backward directions were measured and compared at 5 and 295 K by micro thermoreflectance. The Si thin film with dog-leg shaped nanostructures showed lower thermal conductivities than those of nanowires and two-dimensional phononic crystals with circular holes at the same surface-to-volume ratio. However, asymmetric thermal conductivity was not observed at small temperature gradient condition in spite of the highly asymmetric shape though the size of the pattern is within thermal phonon mean free path range. We conclude that strong temperature dependent thermal conductivity is required to observe the asymmetric thermal phonon conduction in monolithic materials with asymmetric nanostructures.

  3. Ultrathin films of polycrystalline MnGa alloy with perpendicular magnetic anisotropy

    NASA Astrophysics Data System (ADS)

    Ono, Atsuo; Suzuki, Kazuya Z.; Ranjbar, Reza; Sugihara, Atsushi; Mizukami, Shigemi

    2017-02-01

    Room temperature growth of textured polycrystalline films of MnGa alloys using a CoGa buffer layer on a thermally oxidized Si substrate is demonstrated. MnGa thin films with a thickness of 2 nm exhibit out-of-plane rectangular hysteresis loops. A small saturation magnetization of about 200 emu/cm3 and a large perpendicular magnetic anisotropy of up to 3–5 Merg/cm3 were achieved for 2- and 3-nm-thick MnGa ultrathin films; such values have never been reported before, and they provide a pathway for integration with conventional Si technology.

  4. Using SiOx nano-films to enhance GZO Thin films properties as front electrodes of a-Si solar cells

    NASA Astrophysics Data System (ADS)

    Chang, Kow-Ming; Ho, Po-Ching; Yu, Shu-Hung; Hsu, Jui-Mei; Yang, Kuo-Hui; Wu, Chin-Jyi; Chang, Chia-Chiang

    2013-07-01

    One of the essential applications of transparent conductive oxides is as front electrodes for superstrate silicon thin-film solar cells. Textured TCO thin films can improve absorption of sunlight for an a-Si:H absorber during a single optical path. In this study, high-haze and low-resistivity bilayer GZO/SiOx thin films prepared using an atmospheric pressure plasma jet (APPJ) deposition technique and dc magnetron sputtering. The silicon subdioxide nano-film plays an important role in controlling the haze value of subsequent deposited GZO thin films. The bilayer GZO/SiOx (90 sccm) sample has the highest haze value (22.30%), the lowest resistivity (8.98 × 10-4 Ω cm), and reaches a maximum cell efficiency of 6.85% (enhanced by approximately 19% compared to a sample of non-textured GZO).

  5. The hybrid photocatalyst of TiO2-SiO2 thin film prepared from rice husk silica

    NASA Astrophysics Data System (ADS)

    Klankaw, P.; Chawengkijwanich, C.; Grisdanurak, N.; Chiarakorn, Siriluk

    2012-03-01

    The TiO2-SiO2 thin film was prepared by self-assembly method by mixing SiO2 precursor with titanium precursor solution and aged to obtain a co-precipitation of silica and titanium crystals. Dip coating method was applied for thin film preparation on glass slide. The X-ray diffraction (XRD) of the self-assembly thin film had no characteristic property of SiO2 and even anatase TiO2 but indicated new crystal structure which was determined from the Fourier Transform Infrared Spectrophotometer (FTIR) as a hybridized Ti-O-Si bonding. The surface area and surface volume of the self-assembly sample were increased when SiO2 was incorporated into the film. The self-assembly TiO2-SiO2 thin film exhibited the enhanced photocatalytic decolorization of methylene blue (MB) dye. The advantages of SiO2 are; (1) to increase the adsorbability of the film and (2) to provide the hydroxyl radical to promote the photocatalytic reaction. The self-assembly thin film with the optimum molar ratio (SiO2:TiO2) as 20:80 gave the best performance for photocatalytic decolorization of MB dye with the overall efficiency of 81%.

  6. Hydrogen plasma induced modification of photoluminescence from a-SiNx:H thin films

    NASA Astrophysics Data System (ADS)

    Bommali, R. K.; Ghosh, S.; Vijaya Prakash, G.; Gao, K.; Zhou, S.; Khan, S. A.; Srivastava, P.

    2014-02-01

    Low temperature (250-350 °C) hydrogen plasma annealing (HPA) treatments have been performed on amorphous hydrogenated silicon nitride (a-SiNx:H) thin films having a range of compositions and subsequent modification of photoluminescence (PL) is investigated. The PL spectral shape and peak positions for the as deposited films could be tuned with composition and excitation energies. HPA induced modification of PL of these films is found to depend on the N/Si ratio (x). Upon HPA, the PL spectra show an emergence of a red emission band for x ≤ 1, whereas an overall increase of intensity without change in the spectral shape is observed for x > 1. The emission observed in the Si rich films is attributed to nanoscale a-Si:H inclusions. The enhancement is maximum for off-stoichiometric films (x ˜ 1) and decreases as the compositions of a-Si (x = 0) and a-Si3N4 (x = 1.33) are approached, implying high density of non-radiative defects around x = 1. The diffusion of hydrogen in these films is also analyzed by Elastic Recoil Detection Analysis technique.

  7. The structure of a-Si 1-xSn x:H thin films

    NASA Astrophysics Data System (ADS)

    Edwards, A. M.; Fairbanks, M. C.; Newport, R. J.

    1990-12-01

    The doping of a-Si:H with Sn is known to modify the electrical and optical properties of the material. The optical band gap decreases as the doping level is increased, however, there is no insulator-metal transition of the type observed, for example, when transition metals are used as dopants. In order to increase the understanding of the conductivity processes that occur in a-Si:metal:H alloys we have measured the atomic scale structure of a series of a-Si 1- xSn x:H thin-films using EXAFS. Samples were prepared by RF reactive co-sputtering and both Si and Sn K-edge EXAFS examined. The results indicate that the Sn atoms are substituted randomly into the a-Si tetrahedral random network. Both Si and Sn atoms retain fourfold co-ordination over the composition range studied (0⩽ x⩽0.18). In contrast to results obtained using transition metal dopants there is no local modification of the tetrahedral random network.

  8. Improved efficiency of ultra-thin µc-Si solar cells with photonic-crystal structures.

    PubMed

    Ishizaki, Kenji; De Zoysa, Menaka; Tanaka, Yoshinori; Umeda, Takami; Kawamoto, Yosuke; Noda, Susumu

    2015-09-21

    We investigate the improvement of the conversion efficiency of ultra-thin (~500nm-thick) microcrystalline silicon (μc-Si) solar cells incorporating photonic-crystal structures, where light absorption is strongly enhanced by the multiple resonant modes in the photonic crystal. We focus on the quality of the intrinsic μc-Si layer deposited on the substrate, which is structured to form a photonic crystal at its upper surface with a period of several hundred nanometers. We first study the crystalline quality from the viewpoint of the crystalline fraction and show that the efficiency can be improved when the deposition conditions for the μc-Si layer are tuned to give an almost constant crystalline fraction of ~50% across the entire film. We then study the influence of the photonic-crystal structure on the crystalline quality. From transmission-electron microscope images, we show that the collision of μc-Si grains growing at different angles occurs when a photonic-crystal structure with an angular surface is used; this can be suppressed by introducing a rounded surface structure. As a result, we demonstrate an efficiency of 8.7% in a ~500-nm thick, homo-junction μc-Si solar cell, which has only ~1/4 the thickness of typical μc-Si solar cells. We also discuss the possibility of further improving the efficiency by performing calculations that focus on the absorption characteristics of the fabricated cell structure.

  9. Surfactant-mediated epitaxy of thin germanium films on SiGe(001) virtual substrates

    NASA Astrophysics Data System (ADS)

    Schmidt, J.; Tetzlaff, D.; Bugiel, E.; Wietler, T. F.

    2017-01-01

    We report on the impact of a surfactant on the growth mode and strain relaxation of thin Ge films on Si0.21Ge0.79 virtual substrates grown by surfactant mediated epitaxy on Si(001) wafers. Ge epitaxy without surfactant results in island formation after deposition of only 5 nm Ge. A certain part of the strain in the Ge islands is relaxed via interfacial misfit dislocations, which are located within the core part of the islands. We discuss the possibilities for the occurrence of three-dimensional growth at low Ge layer thickness. The use of Sb as a surfactant suppresses three-dimensional islanding and enables the growth of smooth pseudomorphically strained Ge films on Si0.21Ge0.79(001) virtual substrates up to a thickness of 10 nm. At thicknesses higher than 20 nm, the films relax via the formation of a misfit dislocation network at the Ge/ Si1-xGex interface. The surface roughness of up to 30 nm thick layers is below 1.6 nm. Our experimental results corroborate the calculated thickness for plastic relaxation of Ge on Si1-xGex. The effect of the surfactant on the growth of the virtual substrate and on the subsequent growth of Ge on Si0.21Ge0.79 is discussed.

  10. Thermochromic properties of VO2 thin film on SiNx buffered glass substrate

    NASA Astrophysics Data System (ADS)

    Koo, Hyun; You, HyunWoo; Ko, Kyeong-Eun; Kwon, O.-Jong; Chang, Se-Hong; Park, Chan

    2013-07-01

    VO2 thin films were deposited on soda lime glass substrates with silicon nitride sodium-diffusion barrier layer as diffusion barrier, in order to investigate the effect of sodium ion diffusion on the formation of VO2. SiNx layers with thicknesses over 30 nm were found to successfully prevent sodium ion diffusion in VO2 thin film and also contribute to the formation of VO2 thin film, which was confirmed by XRD spectra and XPS measurements. The change of infrared transmittance at 2500 nm wavelength with temperature change from room temperature to 80 °C was increased significantly, and the optical hysteresis width of the sample decreased by almost 6 K as well. The results suggest that applying diffusion barrier can improve the thermochromic properties of the VO2 films for energy-saving smart coatings, and silicon nitride can be one of the effective materials to prevent sodium ion diffusion.

  11. Epitaxial Growth of Silicon Films on SiO2 Patterned Si(100) Substrates by Atmospheric Pressure Chemical Vapor Deposition

    NASA Astrophysics Data System (ADS)

    Duan, Chunyan; Deng, Youjun; Ai, Bin; Liu, Chao; Zhuang, Lin; Shen, Hui

    2012-09-01

    In order to investigate the effect of selective area nucleation on epitaxial growth of silicon (Si) films, 35 µm thick Si films were deposited by atmospheric pressure chemical vapor deposition (APCVD) under the standard condition on two kinds of SiO2 patterned Si(100) wafers. One was circular patterns, and the other was striated patterns. Then, the structural properties of the as-deposited silicon thin films were investigated by metallurgical microscope, scanning electron microscopy (SEM) and high-resolution transmission electron microscopy (TEM). The results show that normal epitaxial growth occurs on the exposed Si(100) regions, while just polycrystalline Si deposition happens on the SiO2 regions. Moreover, for the substrates with circular patterns, the as-deposited Si thin films possess pyramid surface morphology thus excellent light trapping performance being spontaneously formed, and the sizes of the pyramid grains approximately equal to the sum of the diameter and spacing of the round exposed Si regions.

  12. Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching

    NASA Astrophysics Data System (ADS)

    Ghazaryan, Lilit; Kley, E.-Bernhard; Tünnermann, Andreas; Szeghalmi, Adriana

    2016-06-01

    A new route to prepare nanoporous SiO2 films by mixing atomic-layer-deposited alumina and silica in an Å-scale is presented. The selective removal of Al2O3 from the composites using wet chemical etching with phosphoric acid resulted in nanoporous thin SiO2 layers. A diffusion-controlled dissolution mechanism is identified whereby an interesting reorganization of the residual SiO2 is observed. The atomic scale oxide mixing is decisive in attaining and tailoring the film porosity. The porosity and the refractive index of nanoporous silica films were tailored from 9% to 69% and from 1.40 to 1.13, respectively. The nanoporous silica was successfully employed as antireflection coatings and as diffusion membranes to encapsulate nanostructures.

  13. Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching.

    PubMed

    Ghazaryan, Lilit; Kley, E-Bernhard; Tünnermann, Andreas; Szeghalmi, Adriana

    2016-06-24

    A new route to prepare nanoporous SiO2 films by mixing atomic-layer-deposited alumina and silica in an Å-scale is presented. The selective removal of Al2O3 from the composites using wet chemical etching with phosphoric acid resulted in nanoporous thin SiO2 layers. A diffusion-controlled dissolution mechanism is identified whereby an interesting reorganization of the residual SiO2 is observed. The atomic scale oxide mixing is decisive in attaining and tailoring the film porosity. The porosity and the refractive index of nanoporous silica films were tailored from 9% to 69% and from 1.40 to 1.13, respectively. The nanoporous silica was successfully employed as antireflection coatings and as diffusion membranes to encapsulate nanostructures.

  14. Growth temperature effect on a-Si:H thin films studied by constant photocurrent method

    NASA Astrophysics Data System (ADS)

    Wadibhasme, N. A.; Dusane, R. O.

    2013-02-01

    Hydrogenated amorphous silicon (a-Si:H) thin films are synthesized by tuning different process parameters among which substrate temperature of film growth plays an important role in monitoring the device quality of the film. In this paper we have used the constant photocurrent method (CPM) to study the effect of growth temperature on the electronic and optical parameters of a-Si:H films at different photon energies. This technique primarily measures the absorption coefficient which is a result of different electronic transitions that contribute to the photocurrent. The nature of absorption coefficient changes with growth temperature that explicitly provides the information about the density of defect states present in the mid gap of a-Si:H.

  15. Microstructure and mechanical properties of thin Al-Si-Ge films

    SciTech Connect

    Kirchner, S.; Kraft, O.; Baker, S.P.; Arzt, E.

    1997-05-01

    The mechanical properties are thought to play an important role in the performance of metallization materials for very large scale integration (VLSI) applications. From recent investigations on bulk materials it is known that Al-Si-Ge alloys can be very efficiently strengthened with only a small amount of the alloying elements. These alloys are potential candidates for future metallizations both because Si and Ge are compatible with the existing semiconductor technology, and because the resistivity is expected to be low. The authors present the first results of detailed characterizations of Al-Si-Ge thin films as a function of sputter conditions and heat treatments. The microstructure was characterized using x-ray diffraction and transmission electron microscopy. The kinetics of precipitation were studied using resistance measurements. Room temperature hardness was investigated using nanoindentation, and the mechanical properties at temperatures up to 240 C were examined using a substrate curvature method. The correlation between precipitate structure and film properties is discussed.

  16. Transparent polycrystalline cubic silicon nitride.

    PubMed

    Nishiyama, Norimasa; Ishikawa, Ryo; Ohfuji, Hiroaki; Marquardt, Hauke; Kurnosov, Alexander; Taniguchi, Takashi; Kim, Byung-Nam; Yoshida, Hidehiro; Masuno, Atsunobu; Bednarcik, Jozef; Kulik, Eleonora; Ikuhara, Yuichi; Wakai, Fumihiro; Irifune, Tetsuo

    2017-03-17

    Glasses and single crystals have traditionally been used as optical windows. Recently, there has been a high demand for harder and tougher optical windows that are able to endure severe conditions. Transparent polycrystalline ceramics can fulfill this demand because of their superior mechanical properties. It is known that polycrystalline ceramics with a spinel structure in compositions of MgAl2O4 and aluminum oxynitride (γ-AlON) show high optical transparency. Here we report the synthesis of the hardest transparent spinel ceramic, i.e. polycrystalline cubic silicon nitride (c-Si3N4). This material shows an intrinsic optical transparency over a wide range of wavelengths below its band-gap energy (258 nm) and is categorized as one of the third hardest materials next to diamond and cubic boron nitride (cBN). Since the high temperature metastability of c-Si3N4 in air is superior to those of diamond and cBN, the transparent c-Si3N4 ceramic can potentially be used as a window under extremely severe conditions.

  17. Transparent polycrystalline cubic silicon nitride

    NASA Astrophysics Data System (ADS)

    Nishiyama, Norimasa; Ishikawa, Ryo; Ohfuji, Hiroaki; Marquardt, Hauke; Kurnosov, Alexander; Taniguchi, Takashi; Kim, Byung-Nam; Yoshida, Hidehiro; Masuno, Atsunobu; Bednarcik, Jozef; Kulik, Eleonora; Ikuhara, Yuichi; Wakai, Fumihiro; Irifune, Tetsuo

    2017-03-01

    Glasses and single crystals have traditionally been used as optical windows. Recently, there has been a high demand for harder and tougher optical windows that are able to endure severe conditions. Transparent polycrystalline ceramics can fulfill this demand because of their superior mechanical properties. It is known that polycrystalline ceramics with a spinel structure in compositions of MgAl2O4 and aluminum oxynitride (γ-AlON) show high optical transparency. Here we report the synthesis of the hardest transparent spinel ceramic, i.e. polycrystalline cubic silicon nitride (c-Si3N4). This material shows an intrinsic optical transparency over a wide range of wavelengths below its band-gap energy (258 nm) and is categorized as one of the third hardest materials next to diamond and cubic boron nitride (cBN). Since the high temperature metastability of c-Si3N4 in air is superior to those of diamond and cBN, the transparent c-Si3N4 ceramic can potentially be used as a window under extremely severe conditions.

  18. Transparent polycrystalline cubic silicon nitride

    PubMed Central

    Nishiyama, Norimasa; Ishikawa, Ryo; Ohfuji, Hiroaki; Marquardt, Hauke; Kurnosov, Alexander; Taniguchi, Takashi; Kim, Byung-Nam; Yoshida, Hidehiro; Masuno, Atsunobu; Bednarcik, Jozef; Kulik, Eleonora; Ikuhara, Yuichi; Wakai, Fumihiro; Irifune, Tetsuo

    2017-01-01

    Glasses and single crystals have traditionally been used as optical windows. Recently, there has been a high demand for harder and tougher optical windows that are able to endure severe conditions. Transparent polycrystalline ceramics can fulfill this demand because of their superior mechanical properties. It is known that polycrystalline ceramics with a spinel structure in compositions of MgAl2O4 and aluminum oxynitride (γ-AlON) show high optical transparency. Here we report the synthesis of the hardest transparent spinel ceramic, i.e. polycrystalline cubic silicon nitride (c-Si3N4). This material shows an intrinsic optical transparency over a wide range of wavelengths below its band-gap energy (258 nm) and is categorized as one of the third hardest materials next to diamond and cubic boron nitride (cBN). Since the high temperature metastability of c-Si3N4 in air is superior to those of diamond and cBN, the transparent c-Si3N4 ceramic can potentially be used as a window under extremely severe conditions. PMID:28303948

  19. Advanced Micro-Polycrystalline Silicon Films Formed by Blue-Multi-Laser-Diode Annealing

    NASA Astrophysics Data System (ADS)

    Noguchi, Takashi; Chen, Yi; Miyahira, Tomoyuki; de Dieu Mugiraneza, Jean; Ogino, Yoshiaki; Iida, Yasuhiro; Sahota, Eiji; Terao, Motoyasu

    2010-03-01

    Semiconductor blue-multi-laser-diode annealing (BLDA) for amorphous Si film was performed to obtain a film containing uniform polycrystalline silicon (poly-Si) grains as a low temperature poly-Si (LTPS) process used for thin-film transistor (TFT). By adopting continuous wave (CW) mode at the 445 nm wavelength of the BLDA system, the light beam is efficiently absorbed into the thin amorphous silicon film of 50 nm thickness and can be crystallized stably. By adjusting simply the laser power below 6 W with controlled beam shape, the isotropic Si grains from uniform micro-grains to arbitral grain size of polycrystalline phase can be obtained with reproducible by fixing the scan speed at 500 mm/s. As a result of analysis using electron microscopy and atomic force microscopy (AFM), uniform distributed micro-poly-Si grains of smooth surface were observed at a power condition below 5 W and the preferred crystal orientation of (111) face was confirmed. As arbitral grain size can be obtained stably and reproducibly merely by controlling the laser power, BLDA is promising as a next-generation LTPS process for AM OLED panel including a system on glass (SoG).

  20. [Study on the Properties of the Pc-Si Films Prepared by Magnetron Co-Sputtering at Low Temperature].

    PubMed

    Duan, Liang-fei; Yang, Wen; Zhang, Li-yuan; Li, Xue-ming; Chen, Xiao-bo; Yang, Pei-zhi

    2016-03-01

    The polycrystalline silicon thin films play an important role in the field of electronics. In the paper, α-SiAl composite membranes on glass substrates was prepared by magnetron co-sputtering. The contents of Al radicals encapsulated-in the α-Si film can be adjusted by changing the Al to Si sputtering power ratios. The as-prepared α-Si films were converted into polycrystalline films by using a rapid thermal annealing (RTP) at low temperature of 350 degrees C for 10 minutes in N2 atmosphere. An X-ray diffractometer, and Raman scattering and UV-Visible-NIR Spectrometers were used to characterize the properties of the Pc-Si films. The influences of Al content on the properties of the Pc-Si films were studied. The results showed that the polycrystalline silicon films were obtained from α-SiAl composite films which were prepared by magnetron co-sputtering at a low temperature following by a rapid thermal annealing. The grain size and the degree of crystallization of the Pc-Si films increased with the increase of Al content, while the optical band gap was reduced. The nc-Si films were prepared when the Al to Si sputtering power ratio was 0.1. And a higher Crystallization rate (≥ 85%) of polycrystalline silicon films were obtained when the ratio was 0.3. The band gaps of the polycrystalline silicon films can be controlled by changing the aluminum content in the films.

  1. Varying stress of SiOxCy thin films deposited by plasma polymerization.

    PubMed

    Liao, Wei-Bo; Chang, Ya-Chen; Jaing, Cheng-Chung; Cheng, Ching-Long; Lee, Cheng-Chung; Wei, Hung-Sen; Kuo, Chien-Cheng

    2017-02-01

    SiOxCy thin films were deposited by plasma polymerization. The stress of the deposited SiOxCy thin films can be modified by adjusting the beam current, the anode voltage, and the flow rate of hexamethyldisiloxane (HMDSO) gas and oxygen. Reducing the beam current or increasing the flow rate of HMDSO gas increased the linear/cage structure ratio and turned the stress of the SiOxCy thin films from compressive to tensile. The linear/cage structure ratio can be adjusted by changing the composite parameter, W[FM]c/[FM]m, to control the stress of the deposited plasma polymer films. Multilayers of TiO2/SiO2/TiO2 were coated on a SiOxCy plasma polymer film herein, reducing their stress by 70% from 0.06 to 0.018 GPa. The refractive index is 1.55, and the absorption coefficient is less than 10-4 at 550 nm of the SiOxCy films. Superior optical performances of SiOxCy thin films make their use in optical thin films.

  2. Recombination and thin film properties of silicon nitride and amorphous silicon passivated c-Si following ammonia plasma exposure

    SciTech Connect

    Wan, Yimao; Thomson, Andrew F.; Cuevas, Andres; McIntosh, Keith R.

    2015-01-26

    Recombination at silicon nitride (SiN{sub x}) and amorphous silicon (a-Si) passivated crystalline silicon (c-Si) surfaces is shown to increase significantly following an ammonia (NH{sub 3}) plasma exposure at room temperature. The effect of plasma exposure on chemical structure, refractive index, permittivity, and electronic properties of the thin films is also investigated. It is found that the NH{sub 3} plasma exposure causes (i) an increase in the density of Si≡N{sub 3} groups in both SiN{sub x} and a-Si films, (ii) a reduction in refractive index and permittivity, (iii) an increase in the density of defects at the SiN{sub x}/c-Si interface, and (iv) a reduction in the density of positive charge in SiN{sub x}. The changes in recombination and thin film properties are likely due to an insertion of N–H radicals into the bulk of SiN{sub x} or a-Si. It is therefore important for device performance to minimize NH{sub 3} plasma exposure of SiN{sub x} or a-Si passivating films during subsequent fabrication steps.

  3. Enlargement of Step-Free SiC Surfaces by Homoepitaxial Web-Growth of Thin SiC Cantilevers

    NASA Technical Reports Server (NTRS)

    Neudeck, Philip G.; Powell, J. Anthony; Beheim, Glenn M.; Benavage, Emye L.; Abel, Phillip B.; Trunek, Andrew J.; Spry, David J.; Dudley, Michael; Vetter, William M.

    2002-01-01

    Lateral homoepitaxial growth of thin cantilevers emanating from mesa patterns that were reactive ion etched into on-axis commercial SiC substrates prior to growth is reported. The thin cantilevers form after pure stepflow growth removes almost all atomic steps from the top surface of a mesa, after which additional adatoms collected by the large step-free surface migrate to the mesa sidewall where they rapidly incorporate into the crystal near the top of the mesa sidewall. The lateral propagation of the step-free cantilevered surface is significantly affected by pregrowth mesa shape and orientation, with the highest lateral expansion rates observed at the inside concave comers of V-shaped pregrowth mesas with arms lengthwise oriented along the {1100} direction. Complete spanning of the interiors of V's and other mesa shapes with concave comers by webbed cantilevers was accomplished. Optical microscopy, synchrotron white beam x-ray topography and atomic force microscopy analysis of webbed regions formed over a micropipe and closed-core screw dislocations show that c-axis propagation of these defects is terminated by the webbing. Despite the nonoptimized process employed in this initial study, webbed surfaces as large as 1.4 x 10(exp -3) square centimeters, more than four times the pregrowth mesa area, were grown. However, the largest webbed surfaces were not completely free of bilayer steps, due to unintentional growth of 3C-SiC that occurred in the nonoptimized process. Further process optimization should enable larger step-free webs to be realized.

  4. Electronic sputtering of thin SiO 2 films by MeV heavy ions

    NASA Astrophysics Data System (ADS)

    Arnoldbik, W. M.; Tomozeiu, N.; Habraken, F. H. P. M.

    2003-04-01

    The rate of removal of material from SiO 2 as a result of heavy ion irradiation, with energies in which energy loss via excitation and ionization of the solid predominates, depends strongly on the stopping power and angle of incidence of the incoming ions. There appears to be a threshold stopping power for SiO 2 of 500 eV/(10 15 at/cm 2) (or 3.5 keV/nm). This electronic sputter yield has been found to reach values as large as 10 4 atoms/incoming ion for 66 MeV Ag ions at an angle of incidence of 7° with the plane of the surface. Strikingly, the electronic sputter yield is very small for thin SiO 2 layers of a thickness ⩽1 nm when grown on c-Si, but it is appreciable for such layers deposited on the insulator silicon nitride. The data are discussed in the light of existing models for electronic sputtering invoking also models for potential sputtering of SiO 2 by low-energy, highly charged ions.

  5. Design of Sequential Lateral Solidification Crystallization Method for Low Temperature Poly-Si Thin Film Transistors

    NASA Astrophysics Data System (ADS)

    Park, Ji-Yong; Park, Hye-Hyang; Lee, Ki-Yong; Chung, Ho-Kyoon

    2004-04-01

    Sequential lateral solidification (SLS) is known as a promising method for making low-temperature poly-Si thin film transistors (LTPS TFT) with superior performance for the fabrication of highly circuit-integrated flat panel displays such as TFT liquid crystal display (LCD) and TFT organic light Emitting diode (OLED). In this work we studied the dependence of TFT characteristics on SLS poly-Si grain width and suggested the methods of designing SLS mask pattern to achieve uniform TFT performance. We varied the width of the poly-Si grain by employing the 2-shot SLS mask pattern with different overlaps between the 1st and 2nd laser pulses. The width of the poly-Si grain decreased with decreasing the overlap. However, the measured TFT characteristics revealed that the width of the poly-Si grain negligibly influences the device properties. We could achieve the TFT mobility of approximately 350 cm2/V\\cdots for the overlap of not less than 1 μm. We suggested that the SLS mask pattern (x, y) should be designed such that 2+y≤ x<2 (C-SLG distance) and y > (optical resolution), where x is the spacing of the laser-absorbed region and y is the spacing of the laser-nonabsorbed region on the substrate.

  6. Deposition of thin Si and Ge films by ballistic hot electron reduction in a solution-dripping mode and its application to the growth of thin SiGe films

    NASA Astrophysics Data System (ADS)

    Suda, Ryutaro; Yagi, Mamiko; Kojima, Akira; Mentek, Romain; Mori, Nobuya; Shirakashi, Jun-ichi; Koshida, Nobuyoshi

    2015-04-01

    To enhance the usefulness of ballistic hot electron injection into solutions for depositing thin group-IV films, a dripping scheme is proposed. A very small amount of SiCl4 or GeCl4 solution was dripped onto the surface of a nanocrystalline Si (nc-Si) electron emitter, and then the emitter is driven without using any counter electrodes. It is shown that thin Si and Ge films are deposited onto the emitting surface. Spectroscopic surface and compositional analyses showed no extrinsic carbon contaminations in deposited thin films, in contrast to the results of a previous study using the dipping scheme. The availability of this technique for depositing thin SiGe films is also demonstrated using a mixture SiCl4+GeCl4 solution. Ballistic hot electrons injected into solutions with appropriate kinetic energies promote preferential reduction of target ions with no by-products leading to nuclei formation for the thin film growth. Specific advantageous features of this clean, room-temperature, and power-effective process is discussed in comparison with the conventional dry and wet processes.

  7. Characterization of Thick and Thin Film SiCN for Pressure Sensing at High Temperatures

    PubMed Central

    Leo, Alfin; Andronenko, Sergey; Stiharu, Ion; Bhat, Rama B.

    2010-01-01

    Pressure measurement in high temperature environments is important in many applications to provide valuable information for performance studies. Information on pressure patterns is highly desirable for improving performance, condition monitoring and accurate prediction of the remaining life of systems that operate in extremely high temperature environments, such as gas turbine engines. A number of technologies have been recently investigated, however these technologies target specific applications and they are limited by the maximum operating temperature. Thick and thin films of SiCN can withstand high temperatures. SiCN is a polymer-derived ceramic with liquid phase polymer as its starting material. This provides the advantage that it can be molded to any shape. CERASET™ also yields itself for photolithography, with the addition of photo initiator 2, 2-Dimethoxy-2-phenyl-acetophenone (DMPA), thereby enabling photolithographical patterning of the pre-ceramic polymer using UV lithography. SiCN fabrication includes thermosetting, crosslinking and pyrolysis. The technology is still under investigation for stability and improved performance. This work presents the preparation of SiCN films to be used as the body of a sensor for pressure measurements in high temperature environments. The sensor employs the phenomenon of drag effect. The pressure sensor consists of a slender sensitive element and a thick blocking element. The dimensions and thickness of the films depend on the intended application of the sensors. Fabrication methods of SiCN ceramics both as thin (about 40–60 μm) and thick (about 2–3 mm) films for high temperature applications are discussed. In addition, the influence of thermosetting and annealing processes on mechanical properties is investigated. PMID:22205871

  8. High-coercivity CoFe2O4 thin films on Si substrates by sol-gel

    NASA Astrophysics Data System (ADS)

    Tang, Xianwu; Jin, Linghua; Wei, Renhuai; Zhu, Xiaoguang; Yang, Jie; Dai, Jianming; Song, Wenhai; Zhu, Xuebin; Sun, Yuping

    2017-01-01

    CoFe2O4 (CFO) thin films with high coercivity HC are desirable in applications. The difficulty in achieving large-area CFO thin films with high coercivity by sol-gel has hindered the development of CFO thin films. Herein, polycrystalline CFO thin films with the room temperature out-of-plane and in-plane coercivity HC respectively reached ~5.9 and 3.6 kOe has been achieved on the silicon substrate by sol-gel. The room-temperature maximum magnetic energy product (BH)max and remanence ratio Mr/Ms are of 1.66 MG Oe and 0.58 respectively, which are also the largest values amongst the CFO thin films prepared by solution methods. At the same time, annealing temperature and thickness effects on the HC, (BH)max and Mr/Ms of the derived CFO thin films have been investigated. It is observed that grain size and residual tensile strain in the derived films play an important role in the variations of HC and Mr/Ms. These results will provide an effective route for fabricating larger-area high-coercivity CFO thin films with low-cost by sol-gel on silicon wafers.

  9. Compositionally graded SiCu thin film anode by magnetron sputtering for lithium ion battery

    SciTech Connect

    Polat, B. D.; Eryilmaz, O. L.; Keles, O; Erdemir, A; Amine, Khalil

    2015-10-22

    Compositionally graded and non-graded composite SiCu thin films were deposited by magnetron sputtering technique on Cu disks for investigation of their potentials in lithium ion battery applications. The compositionally graded thin film electrodes with 30 at.% Cu delivered a 1400 mAh g-1 capacity with 80% Coulombic efficiency in the first cycle and still retained its capacity at around 600 mAh g-1 (with 99.9% Coulombic efficiency) even after 100 cycles. On the other hand, the non-graded thin film electrodes with 30 at.% Cu exhibited 1100 mAh g-1 as the first discharge capacity with 78% Coulombic efficiency but the cycle life of this film degraded very quickly, delivering only 250 mAh g-1 capacity after 100th cycles. Not only the Cu content but also the graded film thickness were believed to be the main contributors to the much superior performance of the compositionally graded SiCu films. We also believe that the Cu-rich region of the graded film helped reduce internal stress build-up and thus prevented film delamination during cycling. In particular, the decrease of Cu content from interface region to the top of the coating reduced the possibility of stress build-up across the film during cycling, thus leading to a high electrochemical performance.

  10. High frequency magnetic properties of FeCoSiB thin films

    NASA Astrophysics Data System (ADS)

    Hadimani, Ravi; Han, Mangui; Jiles, David; Magnetics Research Group Team; Han Team, Prof.

    2014-03-01

    Currently, high frequency properties of magnetic materials are critical for the performances of many mobile electronic devices. Larger permeability can be obtained in ferromagnetic thin films that are suitable for high frequency applications. We report the high frequency properties of FeCoSiB thin films with different treatments and with different structures (single layer or FeCoBSi/SiO2 multilayer). For instance, we have studied the annealing effects on the microwave permeability values. It is found that the as-prepared films and films annealed at 300 °C for 1 hour are found in amorphous states and to be anisotropic in static magnetic properties. Nanocrystalline grains have been found in the films annealed at 400 °C for 1 hour, which are isotropic in magnetic properties. With increasing the annealing temperature, the coercivity and saturation magnetic fields are found decreasing. The resonance frequency shows the same varying trend as the saturation magnetic fields. Very large microwave magnetic losses have been found in all the films, which indicate that FeCoSiB films have potential applications in microwave noise attenuation. This work was supported by the Research Fund for International Young Scientists of NSFC (No. 61250110544), National Natural Science Foundation of China (No. 61271039), and the Program for New Century Excellent Talents in Universities (NCET-11-0060).

  11. Reduced Cu concentration in CuAl-LPE-grown thin Si layers

    SciTech Connect

    Wang, T.H.; Ciszek, T.F.; Asher, S.; Reedy, R.

    1995-08-01

    Cu-Al has been found to be a good solvent system to grow macroscopically smooth Si layers with thicknesses in tens of microns on cast MG-Si substrates by liquid phase epitaxy (LPE) at temperatures near 900{degrees}C. This solvent system utilizes Al to ensure good wetting between the solution and substrate by removing silicon native oxides, and employs Cu to control Al doping into the layers. Isotropic growth is achieved because of a high concentration of solute silicon in the solution and the resulting microscopically rough interface. The incorporation of Cu in the Si layers, however, was a concern since Cu is a major solution component and is generally regarded as a bad impurity for silicon devices due to its fast diffusivity and deep energy levels in the band gap. A study by Davis shows that Cu will nonetheless not degrade solar cell performance until above a level of 10{sup 17} cm{sup -3}. This threshold is expected to be even higher for thin layer silicon solar cells owing to the less stringent requirement on minority carrier diffusion length. But to ensure long term stability of solar cells, lower Cu concentrations in the thin layers are still preferred.

  12. Ferroelectric and ferromagnetic properties in BaTiO{sub 3} thin films on Si (100)

    SciTech Connect

    Singamaneni, Srinivasa Rao Prater, John T.; Punugupati, Sandhyarani; Hunte, Frank; Narayan, Jagdish

    2014-09-07

    In this paper, we report on the epitaxial integration of room temperature lead-free ferroelectric BaTiO{sub 3} thin (∼1050 nm) films on Si (100) substrates by pulsed laser deposition technique through a domain matching epitaxy paradigm. We employed MgO and TiN as buffer layers to create BaTiO{sub 3}/SrRuO{sub 3}/MgO/TiN/Si (100) heterostructures. C-axis oriented and cube-on-cube epitaxial BaTiO{sub 3} is formed on Si (100) as evidenced by the in-plane and out-of-plane x-ray diffraction, and transmission electron microscopy. X-ray photoemission spectroscopic measurements show that Ti is in 4(+) state. Polarization hysteresis measurements together with Raman spectroscopy and temperature-dependent x-ray diffraction confirm the room temperature ferroelectric nature of BaTiO{sub 3}. Furthermore, laser irradiation of BaTiO{sub 3} thin film is found to induce ferromagnetic-like behavior but affects adversely the ferroelectric characteristics. Laser irradiation induced ferromagnetic properties seem to originate from the creation of oxygen vacancies, whereas the pristine BaTiO{sub 3} shows diamagnetic behavior, as expected. This work has opened up the route for the integration of room temperature lead-free ferroelectric functional oxides on a silicon platform.

  13. Polycrystalline Silicon: a Biocompatibility Assay

    SciTech Connect

    Pecheva, E.; Fingarova, D.; Pramatarova, L.; Hikov, T.; Laquerriere, P.; Bouthors, Sylvie; Dimova-Malinovska, D.; Montgomery, P.

    2010-01-21

    Polycrystalline silicon (poly-Si) layers were functionalized through the growth of biomimetic hydroxyapatite (HA) on their surface. HA is the mineral component of bones and teeth and thus possesses excellent bioactivity and biocompatibility. MG-63 osteoblast-like cells were cultured on both HA-coated and un-coated poly-Si surfaces for 1, 3, 5 and 7 days and toxicity, proliferation and cell morphology were investigated. The results revealed that the poly-Si layers were bioactive and compatible with the osteoblast-like cells. Nevertheless, the HA coating improved the cell interactions with the poly-Si surfaces based on the cell affinity to the specific chemical composition of the bone-like HA and/or to the higher HA roughness.

  14. Investigation of the chemo-mechanical coupling in lithiation/delithiation of amorphous Si through simulations of Si thin films and Si nanospheres

    NASA Astrophysics Data System (ADS)

    Wang, Miao; Xiao, Xinran

    2016-09-01

    A strong asymmetric rate behavior between lithiation and delithiation has been observed in amorphous Si (a-Si) anode in the form of thin films, but not in other geometries, such as Si nanospheres. This work investigated the rate behavior of the two geometries through numerical simulations. The results reveal that the rate behavior is affected by the geometry and the constraint of the electrode, the chemo-mechanical coupling, and the prior process. A substrate-constrained film has a relatively low surface/volume ratio and a constant surface area. Its lithiation has a great tendency to be hindered by surface limitation. The chemo-mechanical coupling also plays an important role. The stress profiles differ in the two geometries but both affect the lithiation process more than the delithiation process. The overall delithiation capacity is affected very little by the chemo-mechanical coupling. In cyclic loading, the delithiation capacity is reduced at the same rate as the lithiation capacity because of the low initial state of charge in the electrode. The asymmetric rate behavior was absent under cyclic loading. On the other hand, a slow charging process resulted in a better retained delithiation capacity and an asymmetric rate behavior at higher rates.

  15. Electroluminescence properties of In-doped Zn2SiO4 thin films prepared by sol-gel process

    NASA Astrophysics Data System (ADS)

    Ogawa, Hirotaka; Kan, Akinori; Ikeda, Norihiro; Fujita, Akihiro

    2012-11-01

    The effect of In doping on the electroluminescence (EL) properties of Zn2SiO4:In thin films was investigated. In-doped Zn2SiO4 thin films were deposited on BaTiO3 substrates and their EL properties were characterized in this study. X-ray powder diffraction patterns of In-doped Zn2SiO4 powders revealed a single phase of Zn2SiO4 for In concentrations up to approximately 1.5 mol%, whereas a secondary phase of In2O3 was observed for In concentrations in the range of 2-10 mol%. The maximum luminance of thin film electroluminescent (TFEL) devices varied significantly with the amount of In doping. The highest luminance with blue emission was obtained when 2 mol% In was doped. The blue emission of In-doped Zn2SiO4 thin film may be related to the In substitution for Zn. The 2 mol% In-doped Zn2SiO4 thin film exhibited blue emission with CIE color coordinates of x=0.208 and y=0.086.

  16. High-conductivity SiO2-matrix B-doped Si-NC thin films by following ion-beam treatment

    NASA Astrophysics Data System (ADS)

    Huang, Junjun; Wang, Weiyan; Yang, Jie; Tan, Yongzhen; Chen, Wei; Ge, Tianyu; Zhang, Yajun; Gao, Min; Chen, Zhenming

    2016-09-01

    In this work, further ion-beam was performed on SiO2-matrix B-doped Si-NC (SBC) thin films in order to enhance conductivity. The effect of ionbeam type on the electrical properties of SBC thin films was investigated systematically. The results indicated that the conductivities of SBC thin films were significantly improved by both argon and hydrogen ion-beam treatments, and the higher the hydrogen ion ratio, the higher the conductivity of SBC thin films. The conductivity of SBC thin films was increased from 1.82 × 10-6 S/cm to 3.2 × 10-3 S/cm with following hydrogen-ion-beam treatment. The change in conductivity of SBC thin films was most possibly resultant from the ion-beam treatment facilitating the formation of higher superficial order and lower defects. An alternative method was proposed to prepare high-conductivity SBC thin films, which may be applied to other heterogeneous thin films.

  17. Calculation of optical band gaps of a-Si:H thin films by ellipsometry and UV-Vis spectrophotometry

    NASA Astrophysics Data System (ADS)

    Qiu, Yijiao; Li, Wei; Wu, Maoyang; Fu, Junwei; Jiang, Yadong

    2010-10-01

    Hydrogenated amorphous silicon (a-Si:H) thin films doped with Phosphorus (P) and Nitrogen (N) were deposited by radio frequency plasma enhanced chemical vapor deposition (RF-PECVD). The optical band gaps of the thin films obtained through either changing the gas pressure (P-doped only) or adulterating nitrogen concentration (with fixed P content) were investigated by means of Ellipsometric and Ultraviolet-Visible (UV-Vis) spectroscopy, respectively. Tauc formula was used in calculating the optical band gaps of the thin films in both methods. The results show that Ellipsometry and UV-Vis spectrophotometry can be applied in the research of the optical properties of a-Si:H thin films experimentally. Both methods reflect the variation law of the optical band gaps caused by CVD process parameters, i.e., the optical band gap of the a-Si:H thin films is increased with the rise of the gas pressure or the nitrogen concentration respectively. The difference in optical band gaps of the doped a-Si:H thin films calculated by Ellipsometry or UV-Vis spectrophotometry are not so great that they both can be used to measure the optical band gaps of the thin films in practical applications.

  18. Raman scattering from very thin Si layers of Si/SiO2 superlattices: Experimental evidence of structural modification in the 0.8-3.5 nm thickness region

    NASA Astrophysics Data System (ADS)

    Khriachtchev, Leonid; Räsänen, Markku; Novikov, Sergei; Kilpelä, Olli; Sinkkonen, Juha

    1999-11-01

    Raman study of very thin (⩽3.5 nm) Si layers constituting Si/SiO2 superlattices and grown by molecular beam epitaxy is described. The Raman spectra show systematic dependence on thickness of the Si layers, which highlights the variety of disordered microstructures in the Si/SiO2 superlattices. A clear change in the vibrational properties is found to occur in the 0.8-3.5 nm thickness region. In particular, the Raman spectra are typical for amorphous silicon for the thicker layers, and the characteristic phonon band disappears for the thinner layers, presumably representing another form of Si coordination with a small Raman scattering cross section. In addition, absorption of the material changes essentially with the Si-layer thickness. Photoluminescence is detected from the Si/SiO2 superlattices, the superlattices with 1.2 and 1.8 nm Si layers being the most efficient emitters among our samples, and the photoluminescence is blueshifted with the decrease of the Si-layer thickness. The Raman spectra show no sign of nanocrystalline structure at any thickness of the as-deposited Si layers so that the observed photoluminescence cannot be connected with Si nanocrystallities. Annealing strongly changes the Raman and photoluminescence spectra, a well-ordered Si phase appears in the superlattices, but its increase does not correlate with the photoluminescence, which further disregard it as an emitter. Nevertheless, the emitting phase is not identified in the Raman spectra.

  19. Suppression of magnetostructural transition on GdSiGe thin film after thermal cyclings

    SciTech Connect

    Pires, A. L.; Belo, J. H.; Gomes, I. T.; Hadimani, R. L.; Schlagel, D. L.; Lograsso, T. A.; Jiles, D. C.; Lopes, A. M. L.; Araújo, J. P.; Pereira, A. M.

    2016-09-08

    The influence of thermal cycling on the microstructure, magnetic phase transition and magnetic entropy change of a Gd5Si1.3Ge2.7 thin film up to 1000 cycles is investigated. The authors found that after 1000 cycles a strong reduction of the crystallographic phase responsible for the magnetostructural transition (Orthorhombic II phase) occurs. We attribute this to the chemical disorder, caused by the large number of expansion/compression cycles that the Orthorhombic II phase undergoes across the magnetostructural transition. The suppression of the magnetostructural transition corresponds to a drastic decrease of the thin film magnetic entropy change. Our results reveal the importance of studying the thermal/magnetic cycles influence on magnetostructural transitions as they can damage a real-life device.

  20. Suppression of magnetostructural transition on GdSiGe thin film after thermal cyclings

    DOE PAGES

    Pires, A. L.; Belo, J. H.; Gomes, I. T.; ...

    2016-09-08

    The influence of thermal cycling on the microstructure, magnetic phase transition and magnetic entropy change of a Gd5Si1.3Ge2.7 thin film up to 1000 cycles is investigated. The authors found that after 1000 cycles a strong reduction of the crystallographic phase responsible for the magnetostructural transition (Orthorhombic II phase) occurs. We attribute this to the chemical disorder, caused by the large number of expansion/compression cycles that the Orthorhombic II phase undergoes across the magnetostructural transition. The suppression of the magnetostructural transition corresponds to a drastic decrease of the thin film magnetic entropy change. Our results reveal the importance of studying themore » thermal/magnetic cycles influence on magnetostructural transitions as they can damage a real-life device.« less

  1. Amorphous Si thin film based photocathodes with high photovoltage for efficient hydrogen production.

    PubMed

    Lin, Yongjing; Battaglia, Corsin; Boccard, Mathieu; Hettick, Mark; Yu, Zhibin; Ballif, Christophe; Ager, Joel W; Javey, Ali

    2013-01-01

    An amorphous Si thin film with TiO2 encapsulation layer is demonstrated as a highly promising and stable photocathode for solar hydrogen production. With platinum as prototypical cocatalyst, a photocurrent onset potential of 0.93 V vs RHE and saturation photocurrent of 11.6 mA/cm(2) are measured. Importantly, the a-Si photocathodes exhibit impressive photocurrent of ~6.1 mA/cm(2) at a large positive bias of 0.8 V vs RHE, which is the highest for all reported photocathodes at such positive potential. Ni-Mo alloy is demonstrated as an alternative low-cost catalyst with onset potential and saturation current similar to those obtained with platinum. This low-cost photocathode with high photovoltage and current is a highly promising photocathode for solar hydrogen production.

  2. Transparent conducting CeO{sub 2}-SiO{sub 2} thin films

    SciTech Connect

    Zhu, B.; Luo, Z.; Xia, C.

    1999-08-01

    A new type of transparent thin films, based on two-phase materials of CeO{sub 2}-SiO{sub 2}, was developed. The films were prepared on indium time oxide (ITO)-coated glass via a sol-gel process. A study of cyclic voltammetry was conducted on the films, using an electrolyte of 1 M LiClO{sub 4} in propylene carbonate. Li{sup +} insertion/disinsertion took place in the film. For a 24 nm thick GeO{sub 2}-SiO{sub 2} film with 50% silica, the capacity of the charge exchange reached 6--7 nC/CM{sup 2}. After 380 cycles, the charge density dropped by {approximately}30%. In both Li{sup +}-intercalated and free states, the films were highly transparent for visible light. Such films have potential application in counter-electrodes for electrochromic smart windows and other electrochemical devices.

  3. Nanoindentation of GaN/SiC thin films on silicon substrate

    NASA Astrophysics Data System (ADS)

    Grashchenko, A. S.; Kukushkin, S. A.; Osipov, A. V.; Redkov, A. V.

    2017-03-01

    The indentation process of thin gallium nitride film grown on SiC buffer layer on silicon was studied. SiC was obtained by the new method of substitution of atoms directly in a silicon substrate. Indentation data, atomic force microscopy and Raman spectroscopy were used to characterize the indented system. Mechanical properties of the film and the substrate were derived using single-layer Oliver-Pharr and Doerner-Nix approaches. Micro-Raman confocal microscopy was used to construct 3-dimensional maps of mechanical stresses and crystalline quality both of GaN and silicon near the indenter impression for different indentation depths. The anisotropy of propagation of the elastic stresses during indentation was investigated and it was shown, that distribution of stress in the substrate has a shape of trefoil. This process has been modeled by means of molecular dynamics.

  4. Antireflective downconversion ZnO:Er3+,Yb3+ thin film for Si solar cell applications

    NASA Astrophysics Data System (ADS)

    Elleuch, R.; Salhi, R.; Deschanvres, J.-L.; Maalej, R.

    2015-02-01

    Hexagonal wurtzite phased ZnO:Er3+/Yb3+ thin films with various Yb concentrations were deposited on Si(111) substrate by Aerosol Assisted Chemical Vapor Deposition process. Post-annealed films at 1000 °C in air atmosphere showed a crystallinity enhancement. Yb3+ (4F7/2 → 4F5/2) 1000 nm emission increased with the increase of Yb3+ concentration emanating from an Er-Yb energy transfer. The reflectance percentage of 12% was achieved in the [250-1000 nm] range, and the refractive index of 1.97 was obtained for 632 nm wavelength. These results suggest that the (3 mol. % Er, 9 mol. % Yb) codoped film is a highly efficient antireflective downconversion layer for enhancing Si solar cell efficiency.

  5. Suppression of excess oxygen for environmentally stable amorphous In-Si-O thin-film transistors

    SciTech Connect

    Aikawa, Shinya E-mail: TSUKAGOSHI.Kazuhito@nims.go.jp; Mitoma, Nobuhiko; Kizu, Takio; Tsukagoshi, Kazuhito E-mail: TSUKAGOSHI.Kazuhito@nims.go.jp; Nabatame, Toshihide

    2015-05-11

    We discuss the environmental instability of amorphous indium oxide (InO{sub x})-based thin-film transistors (TFTs) in terms of the excess oxygen in the semiconductor films. A comparison between amorphous InO{sub x} doped with low and high concentrations of oxygen binder (SiO{sub 2}) showed that out-diffusion of oxygen molecules causes drastic changes in the film conductivity and TFT turn-on voltages. Incorporation of sufficient SiO{sub 2} could suppress fluctuations in excess oxygen because of the high oxygen bond-dissociation energy and low Gibbs free energy. Consequently, the TFT operation became rather stable. The results would be useful for the design of reliable oxide TFTs with stable electrical properties.

  6. Accurate characterization of SiO2 thin films using surface acoustic waves.

    PubMed

    Knapp, Matthias; Lomonosov, Alexey M; Warkentin, Paul; Jäger, Philipp M; Ruile, Werner; Kirschner, Hans-Peter; Honal, Matthias; Bleyl, Ingo; Mayer, Andreas P; Reindl, Leonhard M

    2015-04-01

    We have investigated the acoustic properties of silicon dioxide thin films. Therefore, we determined the phase velocity dispersion of LiNbO3 substrate covered with SiO2 deposited by a plasma enhanced chemical vapor deposition and a physical vapor deposition (PVD) process using differential delay lines and laser ultrasonic method. The density p and the elastic constants (c11 and c44) can be extracted by fitting corresponding finite element simulations to the phase velocities within an accuracy of at least +4%. Additionally, we propose two methods to improve the accuracy of the phase velocity determination by dealing with film thickness variation of the PVD process.

  7. One-dimensional edge state of Bi thin film grown on Si(111)

    SciTech Connect

    Kawakami, Naoya; Lin, Chun-Liang; Kawai, Maki; Takagi, Noriaki; Arafune, Ryuichi

    2015-07-20

    The geometric and electronic structures of the Bi thin film grown on Si(111) were investigated by using scanning tunneling microscopy and spectroscopy. We have found two types of edges, one of which hosts an electronic state localized one-dimensionally. We also revealed the energy dispersion of the localized edge state from the evolution of quasiparticle interference patterns as a function of energy. These spectroscopic findings well reproduce those acquired for the cleaved surface of the bulk Bi crystal [I. K. Drozdov et al., Nat. Phys. 10, 664 (2014)]. The present results indicate that the deposited Bi film provides a tractable stage for further scrutiny of the one-dimensional edge state.

  8. Rapid lateral solidification of pure Cu and Au thin films encapsulated in SiO2

    NASA Astrophysics Data System (ADS)

    Kline, J. E.; Leonard, J. P.

    2005-05-01

    Excimer laser melting and lateral resolidification is demonstrated in 200nm thick Cu and Au elemental metal thin films encapsulated between SiO2 layers. Projection irradiation is used to selectively and completely melt lines 3to30μm wide in the metal film—with rapid lateral solidification originating from the unmelted sidewalls of the molten region—resulting in large columnar grains, extending transversely to the middle of the line. Transmission electron microscopy reveals twinning structures and other defects typical of rapid solidification. Encapsulation and control of the fluence are found to be crucial parameters necessary to prevent film dewetting while molten.

  9. Mechanical properties, stress evolution and high-temperature thermal stability of nanolayered Mo{endash}Si{endash}N/SiC thin films

    SciTech Connect

    Torri, P.; Hirvonen, J.; Kung, H.; Lu, Y.; Nastasi, M.; Gibson, P.N.

    1999-07-01

    A study of the microstructure, thermal stability, nanoindentation mechanical properties, and residual stress evolution of nanolayered Mo{endash}Si{endash}N/SiC thin films as a function of vacuum annealing time and temperature is reported. Multilayers of Mo{endash}Si{endash}N (MoSi{sub 2.2}N{sub 2.5}) and SiC were deposited by magnetron sputtering from planar MoSi{sub 2} and SiC targets onto single crystal silicon wafers. The relative amount of both components was varied (12.5{endash}50 vol.thinsp{percent} of SiC) while keeping the bilayer thickness constant (12 nm), or the bilayer thickness was varied (6{endash}24 nm) with constant Mo{endash}Si{endash}N to SiC ratio (25 vol.thinsp{percent} of SiC). Mechanical properties were measured by nanoindentation on as-deposited films and films annealed in vacuum at 500 and 900thinsp{degree}C. Microstructure and thermal stability were examined by cross-sectional transmission electron microscopy, glancing angle x-ray diffraction and nuclear resonance broadening. Stress evolution induced by thermal annealing was determined by measuring optically the change in curvature of coated silicon beams. In the as-deposited state, all films exhibited an amorphous microstructure. At 900thinsp{degree}C SiC still remained amorphous, but Mo{endash}Si{endash}N had developed a microstructure where nanocrystals of Mo{sub 5}Si{sub 3} were embedded in an amorphous matrix. The interface between Mo{endash}Si{endash}N and SiC was indirectly shown to be stable at least up to 41 h annealing at 1075thinsp{degree}C in vacuum. The potential of Mo{endash}Si{endash}N as a barrier layer against intermixing between nanolayered MoSi{sub 2} and SiC at 900thinsp{degree}C has been demonstrated. Hardness, modulus and residual stress followed the volume fraction rule of mixture of both constituents of the nanolayered Mo{endash}Si{endash}N/SiC structure. Consequently, by optimizing the volume fraction of the constituents, zero residual stress on a silicon substrate

  10. Structural and electrical characterization of epitaxial Ge thin films on Si(001) formed by sputtering

    NASA Astrophysics Data System (ADS)

    Otsuka, Shintaro; Mori, Takahiro; Morita, Yukinori; Uchida, Noriyuki; Liu, Yongxun; O’uchi, Shin-ichi; Fuketa, Hiroshi; Migita, Shinji; Masahara, Meishoku; Matsukawa, Takashi

    2017-04-01

    We structurally and electrically characterize sub-10-nm-thick heteroepitaxial Ge films on Si(001), formed by heated sputtering and subsequent rapid thermal annealing (RTA). After RTA treatment at 720 °C, we find the heteroepitaxial Ge films to have smooth surfaces with a roughness root mean square value of 0.54 nm. Raman measurement reveals that the 720 °C RTA improves the crystallinity of Ge films while maintaining abrupt Ge/Si interfaces. Cross-sectional transmission electron microscopy confirms that the 720 °C RTA step effectively reduces stacking faults and dislocations in the Ge films. The Richardson plot of the TaN/Ge/n-Si diode indicates a Schottky barrier height (SBH) of 0.33 V, which is close to the height of 0.37 V measured from the capacitance–voltage measurement. These values are reasonable compared with the reported SBH of the TaN/bulk Ge Schottky barrier diode, indicating that the method involving heated sputtering and subsequent RTA provides adequate thin Ge films for Ge/Si heterostructures.

  11. Evolution of grain size and morphology of Si thin films fabricated on lunar regolith glass

    NASA Astrophysics Data System (ADS)

    Gramajo, C.; Williams, L.; Feltrin, A.; Alemu, A.; Freundlich, A.

    2006-10-01

    A critical requirement for space colonization and in particular for its lunar exploration component is the availability of large amounts of electric energy. Novel architectures which involve the in situ manufacture of solar cells on the Moon using indigenous lunar materials have been proposed to meet this need [1]. In support of this effort, this study delves on several aspects of interest starting from the fabrication of a glass substrate from lunar regolith, to the deposition of Si films and the effects of thermal processing induced changes on the properties of these films. The experiments were implemented using several types of commercially available glasses as well as in-house fabricated regolith glass. In particular, the study provides valuable information on the effect of temperature on the interactions between Si and the substrates, and also the interaction between metallic contact layers and Si, which could affect regions beyond their common interface. This insight sheds a light on the evolution of grain size and morphology of Si thin films grown on lunar regolith.

  12. Transparent conducting Si-codoped Al-doped ZnO thin films prepared by magnetron sputtering using Al-doped ZnO powder targets containing SiC

    SciTech Connect

    Nomoto, Jun-ichi; Miyata, Toshihiro; Minami, Tadatsugu

    2009-07-15

    Transparent conducting Al-doped ZnO (AZO) thin films codoped with Si, or Si-codoped AZO (AZO:Si), were prepared by radio-frequency magnetron sputtering using a powder mixture of ZnO, Al{sub 2}O{sub 3}, and SiC as the target; the Si content (Si/[Si+Zn] atomic ratio) was varied from 0 to 1 at. %, but the Al content (Al/[Al+Zn] atomic ratio) was held constant. To investigate the effect of carbon on the electrical properties of AZO:Si thin films prepared using the powder targets containing SiC, the authors also prepared thin films using a mixture of ZnO, Al{sub 2}O{sub 3}, and SiO{sub 2} or SiO powders as the target. They found that when AZO:Si thin films were deposited on glass substrates at about 200 degree sign C, both Al and Si doped into ZnO acted as effective donors and the atomic carbon originating from the sputtered target acted as a reducing agent. As a result, sufficient improvement was obtained in the spatial distribution of resistivity on the substrate surface in AZO:Si thin films prepared with a Si content (Si/[Si+Zn] atomic ratio) of 0.75 at. % using powder targets containing SiC. The improvement in resistivity distribution was mainly attributed to increases in both carrier concentration and Hall mobility at locations on the substrate corresponding to the target erosion region. In addition, the resistivity stability of AZO: Si thin films exposed to air for 30 min at a high temperature was found to improve with increasing Si content.

  13. Controlled fabrication of Si nanocrystal delta-layers in thin SiO{sub 2} layers by plasma immersion ion implantation for nonvolatile memories

    SciTech Connect

    Bonafos, C.; Ben-Assayag, G.; Groenen, J.; Carrada, M.; Spiegel, Y.; Torregrosa, F.; Normand, P.; Dimitrakis, P.; Kapetanakis, E.; Sahu, B. S.; Slaoui, A.

    2013-12-16

    Plasma Immersion Ion Implantation (PIII) is a promising alternative to beam line implantation to produce a single layer of nanocrystals (NCs) in the gate insulator of metal-oxide semiconductor devices. We report herein the fabrication of two-dimensional Si-NCs arrays in thin SiO{sub 2} films using PIII and rapid thermal annealing. The effect of plasma and implantation conditions on the structural properties of the NC layers is examined by transmission electron microscopy. A fine tuning of the NCs characteristics is possible by optimizing the oxide thickness, implantation energy, and dose. Electrical characterization revealed that the PIII-produced-Si NC structures are appealing for nonvolatile memories.

  14. Positive Bias Instability of Bottom-Gate Zinc Oxide Thin-Film Transistors with a SiOx/SiNx-Stacked Gate Insulator

    NASA Astrophysics Data System (ADS)

    Furuta, Mamoru; Kamada, Yudai; Hiramatsu, Takahiro; Li, Chaoyang; Kimura, Mutsumi; Fujita, Shizuo; Hirao, Takashi

    2011-03-01

    The positive bias instabilities of the zinc oxide thin-film transistors (ZnO TFTs) with a SiOx/SiNx-stacked gate insulator have been investigated. The film quality of a gate insulator of SiOx, which forms an interface with the ZnO channel, was varied by changing the gas mixture ratio of SiH4/N2O/N2 during plasma-enhanced chemical vapor deposition. The positive bias stress endurance of ZnO TFT strongly depended on the deposition condition of the SiOx gate insulator. From the relaxations of the transfer curve shift after imposition of positive bias stress, transfer curves could not be recovered completely without any thermal annealing. A charge trapping in a gate insulator rather than that in bulk ZnO and its interface with a gate insulator is a dominant instability mechanism of ZnO TFTs under positive bias stress.

  15. Extraordinary sensitivity of nanoscale infrared spectroscopy demonstrated on Graphene and thin SiO2

    NASA Astrophysics Data System (ADS)

    Andreev, Greg; Fei, Z.; Bao, W.; Zhao, Z.; Lau, C. N.; Zhang, L. M.; Fogler, M.; Dominguez, G.; Thiemens, M.; Keilmann, F.; Basov, D.

    2011-03-01

    Infrared Spectroscopy is a powerful tool for characterizing materials by their vibrational mode fingerprint and/or electron conductivity. Its application to nanoscale resolved studies is highly desirable but remained challenging mainly for two reasons: a suitable source of intense, broadband infrared illumination was not widely available and the spatial resolution of conventional microscopes was limited by diffraction. We have resolved both issues by utilizing tunable External Cavity Quantum Cascade Lasers (EC-QCLs) as an intense illumination source for a scattering Scanning Near Field Optical Microscope (s-SNOM), capable of 10nm spatial resolution. With this combination of EC-QCLs + s-SNOM we demonstrate 10nm resolution imaging and spectroscopy of extremely thin materials: Silicon oxide layers (SiO) as thin as 2nm and even single atomic layers of Carbon (Graphene). The spectra register contrasts for volumes as small as 20x20x1 nm 3= 400 yoktoliters of SiO2 , and about 70 yl of Graphene over a broad spectral range: 1065 - 2250cm-1 . We explain the origins of this extraordinary sensitivity with an improved theoretical framework for calculating the near field response of a multilayer system.

  16. High Mobility Exceeding 80 cm2 V-1 s-1 in Polycrystalline Ta-Doped SnO2 Thin Films on Glass Using Anatase TiO2 Seed Layers

    NASA Astrophysics Data System (ADS)

    Nakao, Shoichiro; Yamada, Naoomi; Hitosugi, Taro; Hirose, Yasushi; Shimada, Toshihiro; Hasegawa, Tetsuya

    2010-03-01

    High-mobility Ta-doped SnO2 (TTO) thin films were grown on glass substrates by pulsed laser deposition using a seed-layer technique. The use of 10-nm-thick polycrystalline anatase TiO2 seed layers was found to lead to the preferred growth of (200)-oriented TTO films, resulting in a 30% increase in the carrier density and a more than two times increase in mobility, compared to films grown directly on the glass substrates. The highest mobility obtained was 83 cm2 V-1 s-1 with a resistivity of 2.8×10-4 Ω cm, whereas the film with the lowest resistivity of 1.8×10-4 Ω cm had a mobility of 60 cm2 V-1 s-1.

  17. Laser treatment of a-SiC:H thin films for optoelectronic applications

    NASA Astrophysics Data System (ADS)

    Ghica, D.; Mincu, Niculae E.; Stanciu, Catrinel A.; Dinescu, Gheorghe H.; Aldea, E.; Sandu, Viorel; Andrei, A.; Dinescu, Maria; Ferrari, A.; Balucani, M.; Lamedica, G.

    1998-07-01

    Amorphous and hydrogenated (a-SiC:H) as well as crystalline silicon carbide are widespread materials for optoelectronic applications. In this paper, we studied the effect of laser/RF plasma jet treatment of a-SiC:H thin films deposited by Plasma Enhanced Chemical Vapor Deposition, on Si wafers. A Nd:YAG laser ((lambda) equals 1.06 micrometers , tFWHM equals 14 ns, E0 equals 0.015 J/pulse) was used with a fluence of 4 mJ/cm2 incident on the sample, the number of pulses being varied. Plasma treatments were performed in a plasma jet generated by a capacity coupled RF discharge in N2. Different analysis techniques were used to investigate the films, before and after the irradiation: X-ray diffraction, X-ray photoelectron spectroscopy and transmission electron microscopy. We followed the modification of their structure and composition as an effect of the laser/plasma treatment. A comparison with the excimer and also with the RF treatments was performed.

  18. Stress analysis of transferred thin-GaN LED by Au-Si wafer bonding

    NASA Astrophysics Data System (ADS)

    Hsu, S. C.; Liu, C. Y.

    2005-09-01

    Nowadays, the high power GaN-based LED has attracted serious attention for the lighting application. One of key issues for high power GaN-base LED to achieve sufficient lighting efficiency over the traditional light sources, such as, white incandescent and halogen light bulb is the efficiency of heat dissipation. Typically, GaN epi-layer is grown on sapphire substrates. The poor thermal conductivity of sapphire substrate has been identified to be the main limitation for the application of high power GaN LED. To improve the heat dissipation and lighting efficiency, we report a thin GaN structure by using Au-Si wafer bonding and Laser lift-off (LLO) technique. The GaN wafer was first deposited with a Au bonding layer and bonded onto a good thermal conduction substrate, i.e., heavy-doped Si. Then, 248nm KrF excimer Laser was used to strip the original sapphire substrate. To assure a successful GaN epi-layer transferring, Raman spectrum on the transferred GaN layer was performed and the result shows no quality change in the transferred GaN layer. In this work, we also fabricated the vertical LED devices on the transferred GaN epi-layer. Therefore, L-I-V result was obtained which will be presented in this talk. Moreover, we will discuss the effects and advantages of Au-Si bonding on the efficiency of lighting.

  19. Nanostructured multilayered thin film barriers for Mg{sub 2}Si thermoelectric materials

    SciTech Connect

    Battiston, S.; Boldrini, S.; Fiameni, S.; Agresti, F.; Famengo, A.; Fabrizio, M.; Barison, S.

    2012-06-26

    The Mg{sub 2}Si-based alloys are promising candidates for thermoelectric energy conversion in the middle-high temperature range in order to replace lead compounds. The main advantages of silicide-based thermoelectrics are the nontoxicity and the abundance of their constituent elements in the earth crust. The drawback of such kind of materials is their oxygen sensitivity at high temperature that entails their use under vacuum or inert atmosphere. In order to limit the corrosion phenomena, nanostructured multilayered molybdenum silicide-based materials were deposited via RF magnetron sputtering onto stainless steel, alumina and silicon (100) to set up the deposition process and then onto Mg{sub 2}Si pellets. XRD, EDS, FE-SEM and electrical measurements at high temperature were carried out in order to obtain, respectively, the structural, compositional, morphological and electrical characterization of the deposited coatings. At the end, the mechanical behavior of the system thin film/Mg{sub 2}Si-substrate as a function of temperature and the barrier properties for oxygen protection after thermal treatment in air at high temperature were qualitatively evaluated by FE-SEM.

  20. Uniaxially oriented polycrystalline thin films and air-stable n-type transistors based on donor-acceptor semiconductor (diC8BTBT)(FnTCNQ) [n = 0, 2, 4

    NASA Astrophysics Data System (ADS)

    Shibata, Yosei; Tsutsumi, Jun'ya; Matsuoka, Satoshi; Matsubara, Koji; Yoshida, Yuji; Chikamatsu, Masayuki; Hasegawa, Tatsuo

    2015-04-01

    We report the fabrication of high quality thin films for semiconducting organic donor-acceptor charge-transfer (CT) compounds, (diC8BTBT)(FnTCNQ) (diC8BTBT = 2,7-dioctyl[1]benzothieno[3,2-b][1]benzothiophene and FnTCNQ [n = 0,2,4] = fluorinated derivatives of 7,7,8,8,-tetracyanoquinodimethane), which have a high degree of layered crystallinity. Single-phase and uniaxially oriented polycrystalline thin films of the compounds were obtained by co-evaporation of the component donor and acceptor molecules. Organic thin-film transistors (OTFTs) fabricated with the compound films exhibited n-type field-effect characteristics, showing a mobility of 6.9 × 10-2 cm2/V s, an on/off ratio of 106, a sub-threshold swing of 0.8 V/dec, and an excellent stability in air. We discuss the suitability of strong intermolecular donor-acceptor interaction and the narrow CT gap nature in compounds for stable n-type OTFT operation.

  1. Surface modification of grains with silver nano-clusters: a new route to great enhancement of photoluminescence in Eu³⁺-doped ferroelectric polycrystalline oxide thin films.

    PubMed

    Su, Li; Qin, Ni; Sa, Tongliang; Bao, Dinghua

    2013-12-02

    We report on a new route to greatly enhance the photoluminescence of Eu³⁺ doped ferroelectric polycrystalline oxide thin films: surface modification of grains with silver nanoclusters (NCs). The Ag doped Bi₃.₆Eu₀.₄Ti₃O₁₂ (BET) thin films were prepared by a chemical solution deposition method. According to the XRD, TEM and XPS analysis, partially oxidated Ag NCs have been formed on the surfaces of the BET grains. A greatly enhanced photoluminescence was obtained in a wide range of Ag doping level. Role of the Ag NCs in the photoluminescence enhancement was investigated by means of absorption, emission and excitation spectra, as well as decay lifetime measurement. The results indicate that the intra-4f transition of Eu³⁺ can be intensively activated by the coupling of the charge transfer band of BET with the ⁵D₀ state of Eu³⁺ ions, and the enhancement of Eu³⁺ ions emission in the present thin films was attributed to the surface modification of BET crystalline grains by Ag NCs. In addition, the influences of Ag NCs on the dielectric and ferroelectric properties of these materials were discussed as well.

  2. Effects of silicon-on-insulator substrate on the residual stress within 3C-SiC/Si thin films

    NASA Astrophysics Data System (ADS)

    Park, J.-H.; Kim, J. H.; Kim, Y.; Lee, B.-T.; Jang, S.-J.; Moon, C.-K.; Song, H.-J.

    2003-09-01

    Single-crystalline 3C-SiC heteroepitaxial layers were grown on silicon-on-insulator (SOI) and Si wafers, to investigate effects of SOI substrates on the film quality. Residual stress measurement using a laser scan method and the Raman scattering spectroscopy indicated that internal stress within SiC films on SOI were indeed reduced, when compared with that of SiC films on Si.

  3. Observations on Si-based micro-clusters embedded in TaN thin film deposited by co-sputtering with oxygen contamination

    SciTech Connect

    Lee, Young Mi; Jung, Min-Sang; Choi, Duck-Kyun E-mail: mcjung@oist.jp; Jung, Min-Cherl E-mail: mcjung@oist.jp

    2015-08-15

    Using scanning electron microscopy (SEM) and high-resolution x-ray photoelectron spectroscopy with the synchrotron radiation we investigated Si-based micro-clusters embedded in TaSiN thin films having oxygen contamination. TaSiN thin films were deposited by co-sputtering on fixed or rotated substrates and with various power conditions of TaN and Si targets. Three types of embedded micro-clusters with the chemical states of pure Si, SiO{sub x}-capped Si, and SiO{sub 2}-capped Si were observed and analyzed using SEM and Si 2p and Ta 4f core-level spectra were derived. Their different resistivities are presumably due to the different chemical states and densities of Si-based micro-clusters.

  4. Environmental aging in polycrystalline-Si photovoltaic modules: comparison of chamber-based accelerated degradation studies with field-test data

    NASA Astrophysics Data System (ADS)

    Lai, T.; Biggie, R.; Brooks, A.; Potter, B. G.; Simmons-Potter, K.

    2015-09-01

    Lifecycle degradation testing of photovoltaic (PV) modules in accelerated-degradation chambers can enable the prediction both of PV performance lifetimes and of return-on-investment for installations of PV systems. With degradation results strongly dependent on chamber test parameters, the validity of such studies relative to fielded, installed PV systems must be determined. In the present work, accelerated aging of a 250 W polycrystalline silicon module is compared to real-time performance degradation in a similar polycrystalline-silicon, fielded, PV technology that has been operating since October 2013. Investigation of environmental aging effects are performed in a full-scale, industrial-standard environmental chamber equipped with single-sun irradiance capability providing illumination uniformity of 98% over a 2 x 1.6 m area. Time-dependent, photovoltaic performance (J-V) is evaluated over a recurring, compressed night-day cycle providing representative local daily solar insolation for the southwestern United States, followed by dark (night) cycling. This cycle is synchronized with thermal and humidity environmental variations that are designed to mimic, as closely as possible, test-yard conditions specific to a 12 month weather profile for a fielded system in Tucson, AZ. Results confirm the impact of environmental conditions on the module long-term performance. While the effects of temperature de-rating can be clearly seen in the data, removal of these effects enables the clear interpretation of module efficiency degradation with time and environmental exposure. With the temperature-dependent effect removed, the normalized efficiency is computed and compared to performance results from another panel of similar technology that has previously experienced identical climate changes in the test yard. Analysis of relative PV module efficiency degradation for the chamber-tested system shows good comparison to the field-tested system with ~2.5% degradation following

  5. UV/vis range photodetectors based on thin film ALD grown ZnO/Si heterojunction diodes

    NASA Astrophysics Data System (ADS)

    Alkis, Sabri; Tekcan, Burak; Nayfeh, Ammar; Kemal Okyay, Ali

    2013-10-01

    We present ultraviolet-visible (UV/vis) range photodetectors (PDs) based on thin film ZnO (n)/Si (p) heterojunction diodes. ZnO films are grown by the atomic layer deposition (ALD) technique at growth temperatures of 80, 150, 200 and 250 ° C. The fabricated ZnO (n)/Si (p) photodetectors (ZnO-Si-PDs) show good electrical rectification characteristics with ON/OFF ratios reaching up to 103. Under UV (350 nm wavelength) and visible (475 nm wavelength) light illumination, the ZnO-Si-PDs give photoresponsivity values of 30-37 mA W-1 and 74-80 mA W-1 at 0.5 V reverse bias, respectively. Photoluminescence (PL) spectra of ALD grown ZnO thin films are used to support the results.

  6. Ferromagnetism and Nonmetallic Transport of Thin-Film α-FeSi2 : A Stabilized Metastable Material

    DOE PAGES

    Cao, Guixin; Singh, D. J.; Zhang, X. -G.; ...

    2015-04-07

    Tmore » he epitaxially stabilized metallic α-FeSi2 thin films on Si(001) were grown using pulsed laser deposition. While the bulk material of α-FeSi2 is a high temperature metastable phase and nonmagnetic, the thin film is stabilized at room temperature and shows unusual electronic transport and magnetic properties due to strain modification. he transport renders two different conducting states with a strong crossover at 50 K accompanied by an onset of ferromagnetism as well as a substantial magnetocaloric effect and magnetoresistance. hese experimental results are discussed in terms of the unusual electronic structure of α-FeSi2 obtained within density functional calculations and Boltzmann transport calculations with and without strain. Our findings provide an example of a tailored material with interesting physics properties for practical applications.« less

  7. Metal-induced crystallization of amorphous Si thin films assisted by atomic layer deposition of nickel oxide layers.

    PubMed

    So, Byung-Soo; Bae, Seung-Muk; You, Yil-Hwan; Jo, DaiHui; Lee, Sun Sook; Chung, Taek-Mo; Kim, Chang Gyoun; An, Ki-Seok; Hwang, Jin-Ha

    2011-08-01

    Atomic layer deposition (ALD) of nickel oxide was applied to the nickel-induced crystallization of amorphous Si thin films. The nickel-induced crystallization was monitored as a function of annealing temperature and time using Raman spectroscopy. Since Raman spectroscopy allows for the numerical quantification of structural components, the incubation time and the crystallization rates were estimated as functions of the annealing temperature. The spatial locations of a nickel-based species, probably NiSi2, were investigated using X-ray photoelectron spectrometry. The formed NiSi2 seeds appeared to accelerate the crystallization kinetics in amorphous Si thin films deposited onto glass substrates. The ramifications of the atomic layer deposition are discussed with regard to large-panel displays, with special emphasis on the sophisticated control of the catalytic elements, especially nickel.

  8. Thickness of the {SiO2}/{Si} interface and composition of silicon oxide thin films: effect of wafer cleaning procedures

    NASA Astrophysics Data System (ADS)

    Stedile, F. C.; Baumvol, I. J. R.; Oppenheim, I. F.; Trimaille, I.; Ganem, J.-J.; Rigo, S.

    1996-09-01

    We determined the areal density of Si atoms constituting the oxide-silicon interface and the stoichiometry of ultra-thin silicon oxide films, thermally grown on Si(001) in dry 18O 2 atmospheres, using the channeling of α-particles along the <001> axis of the Si substrates associated with grazing angle detection of the scattered particles. The amount of 18O atoms in the films was determined independently using the 18O(p,α) 15N nuclear reaction at 730 keV. The Si wafers were submitted to different cleaning procedures before oxidation in 18O 2, namely: standard RCA cleaning, HF etching followed by a rinse in ethanol and rapid thermal cleaning (RTC) under high vacuum. The stoichiometry of all oxide films having thicknesses between 2 and 13 nm could be fitted assuming a ratio {O}/{Si} = 2 , that is, the films were constituted by silicon dioxide. By comparing the results for samples cleaned in different ways, however, we noticed a pronounced change in the number of atoms in the non-registered Si layers at the {SiO2}/{Si} interface and so in the thickness of these interfaces.

  9. CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES: Growth of High Quality Strained-Si on Ultra-Thin SiGe-on-Insulator Substrate

    NASA Astrophysics Data System (ADS)

    Liu, Xu-Yan; Liu, Wei-Li; Ma, Xiao-Bo; Chen, Chao; Song, Zhi-Tang; Lin, Cheng-Lu

    2009-11-01

    Ultra-thin and near-fully relaxed SiGe substrate is fabricated using a modified Ge condensation technique, and then a 25-nm-thick biaxially tensile strained-Si with a low rms roughness is epitaxially deposited on a SiGeon-Insulator (SGOI) substrate by ultra high vacuum chemical vapor deposition (UHVCVD). High-Resolution cross-sectional transmission electron microscope (HR-XTEM) observations reveal that the strained-Si/SiGe layer is dislocation-free and the atoms at the interface are well aligned. Furthermore, secondary ion mass spectrometry (SIMS) results show a sharp interface between layers and a uniform distribution of Ge in the SiGe layer. One percent in-plane tensile strain in the strained-Si layer is confirmed by ultraviolet (UV) Raman spectra, and the stress maintained even after a 30-s rapid thermal annealing (RTA) process at 1000°C According to those results, devices based on strained-Si are expected to have a better performance than the conventional ones.

  10. CO Oxidation Prefers the Eley-Rideal or Langmuir-Hinshelwood Pathway: Monolayer vs Thin Film of SiC.

    PubMed

    Sinthika, S; Vala, Surya Teja; Kawazoe, Y; Thapa, Ranjit

    2016-03-02

    Using the first-principles approach, we investigated the electronic and chemical properties of wurtzite silicon carbide (2H-SiC) monolayer and thin film structures and substantiated their catalytic activity toward CO oxidation. 2H-SiC monolayer, being planar, is quite stable and has moderate binding with O2, while CO interacts physically; thus, the Eley-Rideal (ER) mechanism prevails over the Langmuir-Hinshelwood (LH) mechanism with an easily cleared activation barrier. Contrarily, 2H-SiC thin film, which exhibits a nonplanar structure, allows moderate binding of both CO and O2 on its surface, thus favoring the LH mechanism over the ER one. Comprehending these results leads to a better understanding of the reaction mechanisms involving structural contrast. Weak overlapping between the 2p(z)(C) and 3p(z)(Si) orbitals of the SiC monolayer system has been found to be the primary reason to revert the active site toward sp(3) hybridization, during interaction with the molecules. In addition, the influences of graphite and Ag(111) substrates on the CO oxidation mechanism were also studied, and it is observed that the ER mechanism is preserved on SiC/G system, while CO oxidation on the SiC/Ag(111) system follows the LH mechanism. The calculated Sabatier activities of the SiC catalysts show that the catalysts are very efficient in catalyzing CO oxidation.

  11. Growth and characterization of GaN thin films on Si(111) substrates using SiC intermediate layer

    SciTech Connect

    Lim, K.Y.; Lee, K.J.; Park, C.I.; Kim, K.C.; Choi, S.C.; Lee, W.H.; Suh, E.K.; Yang, G.M.; Nahm, K.S.

    2000-07-01

    GaN films have been grown atop Si-terminated 3C-SiC intermediate layer on Si(111) substrates using low pressure metalorganic chemical vapor deposition (LP-MOCVD). The SiC intermediate layer was grown by chemical vapor deposition (CVD) using tetramethylsilane (TMS) as the single source precursor. The Si terminated SiC surface was obtained by immediately flow of SiH{sub 4} gas after growth of SiC film. LP-MOCVD growth of GaN on 3C-SiC/Si(111) was carried out with trimethylgallium (TMG) and NH{sub 3}. Single crystalline hexagonal GaN layers can be grown on Si terminated SiC intermediate layer using an AlN or GaN buffer layer. Compared with GaN layers grown using a GaN buffer layer, the crystal qualities of GaN films with AlN buffer layers are extremely improved. The GaN films were characterized by x-ray diffraction (XRD), photoluminescence (PL) and scanning electron microscopy (SEM). Full width at half maximum (FWHM) of double crystal x-ray diffraction (DCXD) rocking curve for GaN (0002) on 3C-SiC/Si(111) was 890 arcsec. PL near band edge emission peak position and FWHM at room temperature are 3.38 eV and 79.35 meV, respectively.

  12. Structural properties of reactively sputtered W-Si-N thin films

    SciTech Connect

    Vomiero, A.; Boscolo Marchi, E.; Quaranta, A.; Della Mea, G.; Brusa, R. S.; Mariotto, G.; Felisari, L.; Frabboni, S.; Tonini, R.; Ottaviani, G.; Mattei, G.; Scandurra, A.; Puglisi, O.

    2007-08-01

    Tungsten-silicon-nitrogen, W-Si-N, ternary thin films have been reactively sputter deposited from W{sub 5}Si{sub 3} and WSi{sub 2} targets using several nitrogen partial pressures. The films have been thermal annealed in the 600-1000 deg. C temperature range and a wide region of the W-Si-N ternary phase diagram has been explored by changing the N{sub 2}/Ar ratio during the deposition. Multitechnique approach was adopted for the analysis of the samples. Composition has been determined via ion beam analysis; chemical states were investigated using x-ray photoelectron spectroscopy (XPS); crystalline structure was studied using transmission electron microscopy (TEM) and x-ray diffraction (XRD) and surface morphology by scanning electron microscope. The films deposited in pure argon atmosphere are tungsten rich and approach the target contents as N{sub 2}/Ar ratio is varied during deposition. Tungsten enrichment in the films is caused by resputtering of silicon which can be inhibited by the formation of silicon nitride, allowing films with Si/W ratio closer to the target compositions. The higher capability to form nitrides with silicon than with tungsten favors enhancement of nitrogen content in samples deposited from the silicon rich target (WSi{sub 2}). The samples with excess nitrogen content have shown losses of this element after thermal treatment. XPS measurements show a break of W-N bonds caused by thermal instability of tungsten nitrides. TEM and XRD revealed the segregation of tungsten in form of metallic or silicide nanoclusters in samples with low nitrogen content (W{sub 58}Si{sub 21}N{sub 21} and W{sub 24}Si{sub 42}N{sub 34}). High amounts of nitrogen were revealed to be highly effective in inhibiting metallic cluster coalescence. Measurements of electrical resistivity of as deposited films were performed using four point probe technique. They were found to lie in the range between 0.4 and 79 m{omega} cm depending on sample composition.

  13. Optical properties of electrochemically deposited ZnO thin films on colloidal crystal film of SiO2 microspheres.

    PubMed

    Oh, Yong Taeg; Choi, Bum Ho; Shin, Dong Chan

    2012-02-01

    The optical properties of electrochemically deposited ZnO thin films on colloidal crystal film of SiO2 microspheres structures were studied. Colloidal crystal film of SiO2 microspheres were self-assembled by evaporation using SiO2 in solution at a constant 0.1 wt%. ZnO in thin films was then electrochemically deposited on to colloidal crystal film of SiO2 microspheres. During electrochemical deposition, the content of Zn(NO3)2 x 6H2O in solution was 5 wt%, and the process's conditions were varied between of 2-4 V and 30-120 s at room temperature, with subsequent heat-treatment between 200 and 400 degrees C. A smooth surface and uniform thickness of 1.8 microm were obtained at 3 V for 90 s. The highest PL peak intensity was obtained in the ZnO thin film heat-treated at 400 degrees C. The double layered ZnO/SiO2 colloidal crystals showed clearly better emission properties than the SiO2/ZnO and ZnO structures.

  14. Influence of substrates on formation of polycrystalline silicon nanowire films

    NASA Astrophysics Data System (ADS)

    Kato, Shinya; Yamazaki, Tatsuya; Miyajima, Shinsuke; Konagai, Makoto

    2014-10-01

    Polycrystalline silicon nanowires (poly-SiNWs) films were successfully prepared by using metal assisted chemical etching of polycrystalline silicon (poly-Si) films. The poly-Si films were prepared by solid-phase crystallization of amorphous silicon (a-Si) deposited by different deposition techniques on different substrates. In the case of the electron beam evaporated a-Si on a quartz substrate, the formation of poly-SiNWs was not observed and the structure was found to be porous silicon. On the other hand, poly-SiNWs successfully formed from poly-Si on a silicon substrate. We also found that deposition techniques for a-Si films affect the formation of poly-SiNWs.

  15. Wake-up effects in Si-doped hafnium oxide ferroelectric thin films

    NASA Astrophysics Data System (ADS)

    Zhou, Dayu; Xu, Jin; Li, Qing; Guan, Yan; Cao, Fei; Dong, Xianlin; Müller, Johannes; Schenk, Tony; Schröder, Uwe

    2013-11-01

    Hafnium oxide based ferroelectric thin films have shown potential as a promising alternative material for non-volatile memory applications. This work reports the switching stability of a Si-doped HfO2 film under bipolar pulsed-field operation. High field cycling causes a "wake-up" in virgin "pinched" polarization hysteresis loops, demonstrated by an enhancement in remanent polarization and a shift of negative coercive voltage. The rate of wake-up is accelerated by either reducing the frequency or increasing the amplitude of the cycling field. We suggest de-pinning of domains due to reduction of the defect concentration at bottom electrode interface as origin of the wake-up.

  16. Interface properties of thin oxide layers grown on strained SiGe layers at low temperatures

    NASA Astrophysics Data System (ADS)

    Mukhopadhyay, M.; Ray, S. K.; Ghosh, T. B.; Sreemany, M.; Maiti, C. K.

    1996-03-01

    The chemical state and the electrical properties of the interfaces of thin oxide films grown on strained 0268-1242/11/3/014/img8 layers using plasma and thermal oxidation have been studied in detail. X-ray photoelectron spectroscopy studies show no Ge pile-up at the oxide/substrate interface. In the case of plasma oxidation, Ge at the oxide surface is found to be in a fully oxidized state, while the formation of an intermediate oxidized state is observed in the case of low-temperature thermal oxidation. High-frequency (1 MHz) capacitance - voltage (C - V) and conductance - voltage (G - V) measurements have indicated the growth of good quality gate oxides. The fixed oxide charge and interface state densities are comparable to those of low-temperature-grown metal - oxide - semiconductor capacitors on Si with aluminium gates.

  17. Fabrication of MnAl thin films with perpendicular anisotropy on Si substrates

    NASA Astrophysics Data System (ADS)

    Huang, Efrem Y.; Kryder, Mark H.

    2015-05-01

    For the first time, perpendicularly magnetized L10-ordered MnAl thin films were demonstrated using a MgO seed layer on Si substrates, which is critical to making spintronic devices. Fabrication conditions were selected by systematically varying sputtering parameters (film thickness, DC sputtering power, in situ substrate temperature, and post-annealing temperature) and investigating structural and magnetic properties. Strong perpendicular magnetic anisotropy with coercivity Hc of 8 kOe, Ku of over 6.5 × 106 erg/cm3, saturation magnetization Ms of 300 emu/cm3, and out-of-plane squareness Mr/Ms of 0.8 were achieved. These MnAl film properties were obtained via DC magnetron sputtering at 530 °C, followed by 350 °C annealing under a 4 kOe magnetic field oriented perpendicular to the film plane.

  18. Elucidating the Surface Reactions of an Amorphous Si Thin Film as a Model Electrode for Li-Ion Batteries.

    PubMed

    Ferraresi, Giulio; Czornomaz, Lukas; Villevieille, Claire; Novák, Petr; El Kazzi, Mario

    2016-11-02

    We investigated during the first lithiation/delithiation process the electrochemical reaction mechanisms at the surface of 30 nm n-doped amorphous silicon (a-Si) thin film used as a negative model electrode for Li-ion batteries. Usage of thin film allowed us to accurately discern the different reaction mechanisms occurring at the surface by avoiding interference from carbon and binder components. The potential dependency of the evolution of the solid electrolyte interphase (SEI) and the reactions on the a-Si and on the copper current collector were elucidated by coupling galvanostatic cycling with postmortem X-ray photoemission spectroscopy and scanning electron microscopy analyses. Our approach revealed the clear reversibility of lithiation/delithiation in the a-Si and native SiO2 layers; such a reaction for SiO2 has not been previously detected and was considered to be an irreversible process. Quantitative and qualitative analyses of the potential-dependent surface evolution revealed the decomposition products of both the salt (LiPF6) and solvent (dimethyl carbonate/ethylene carbonate), giving insight into the complex SEI formation mechanism on the a-Si film but also underlining the strong influence of "inert" materials such as the role of the current collector in the irreversible charge loss. A model mechanism describing the evolutionary complexity of the a-Si surface during the first galvanostatic cycle is proposed and discussed.

  19. Quantum corrections to temperature dependent electrical conductivity of ZnO thin films degenerately doped with Si

    SciTech Connect

    Das, Amit K. Ajimsha, R. S.; Kukreja, L. M.

    2014-01-27

    ZnO thin films degenerately doped with Si (Si{sub x}Zn{sub 1−x}O) in the concentrations range of ∼0.5% to 5.8% were grown by sequential pulsed laser deposition on sapphire substrates at 400 °C. The temperature dependent resistivity measurements in the range from 300 to 4.2 K revealed negative temperature coefficient of resistivity (TCR) for the 0.5%, 3.8%, and 5.8% doped Si{sub x}Zn{sub 1−x}O films in the entire temperature range. On the contrary, the Si{sub x}Zn{sub 1−x}O films with Si concentrations of 1.0%, 1.7%, and 2.0% showed a transition from negative to positive TCR with increasing temperature. These observations were explained using weak localization based quantum corrections to conductivity.

  20. The Effects of Film Thickness and Evaporation Rate on Si-Cu Thin Films for Lithium Ion Batteries.

    PubMed

    Polat, B Deniz; Keles, Ozgul

    2015-12-01

    The reversible cyclability of Si based composite anodes is greatly improved by optimizing the atomic ratio of Si/Cu, the thickness and the evaporation rates of films fabricated by electron beam deposition method. The galvanostatic test results show that 500 nm thick flim, having 10%at. Cu-90%at. Si, deposited with a moderate evaporation rate (10 and 0.9 Å/s for Si and Cu respectively) delivers 2642.37 mAh g(-1) as the first discharge capacity with 76% Coulombic efficiency. 99% of its initial capacity is retained after 20 cycles. The electron conductive pathway and high mechanical tolerance induced by Cu atoms, the low electrical resistivity of the film due to Cu3Si particles, and the homogeneously distributed nano-sized/amorphous particles in the composite thin film could explain this outstanding electrochemical performance of the anode.

  1. Temperature dependence of the interface moments in Co2MnSi thin films

    SciTech Connect

    Arenholz, Elke; Telling, N.; Keatley, P.; Shelford, L.; Arenholz, E.; van der Laan, G.; Hicken, R.; Sakuraba, Y.; Oogane, M.; Ando, Y.; Miyazaki, T.

    2008-03-15

    X-ray magnetic circular dichroism (XMCD) is utilized to explore the temperature dependence of the interface moments in Co{sub 2}MnSi (CMS) thin films capped with aluminium. By increasing the thickness of the capping layer we demonstrate enhanced interface sensitivity of the measurements and the existence of a thin Mn oxide layer at the CMS/Al interface even when a thick capping layer is used. We show that for well ordered L2{sub 1} CMS films there is no significant variation in either the Co or Mn interface moments as a function of temperature. However, a dramatic reduction in the interface moments at low temperature is observed in a disordered CMS film that is likely to be caused by increased Mn-Mn antiferromagnetic coupling. It is suggested that for ordered L2{sub 1} CMS films the temperature dependence of the tunneling magnetoresistance is not related to changes in the interface moments. However, the existence of residual Mn oxide at the CMS/barrier interface could be a contributing factor.

  2. Time-resolved, nonequilibrium carrier dynamics in Si-on-glass thin films for photovoltaic cells

    DOE PAGES

    Serafini, John; Akbas, Yunus; Crandall, Lucas; ...

    2016-03-02

    Here, a femtosecond pump–probe spectroscopy method was used to characterize the growth process and transport properties of amorphous silicon-on-glass, thin films, intended as absorbers for photovoltaic cells. We collected normalized transmissivity change (ΔT/T) waveforms and interpreted them using a comprehensive three-rate equation electron trapping and recombination model. Optically excited ~300–500 nm thick Si films exhibited a bi-exponential carrier relaxation with the characteristic times varying from picoseconds to nanoseconds depending on the film growth process. From our comprehensive trapping model, we could determine that for doped and intrinsic films with very low hydrogen dilution the dominant relaxation mode was carrier trapping;more » while for intrinsic films with large hydrogen content and some texture, it was the standard electron–phonon cooling. In both cases, the initial nonequilibrium relaxation was followed by Shockley–Read–Hall recombination. An excellent fit between the model and the ΔT/T experimental transients was obtained and a correlation between the Si film growth process, its hydrogen content, and the associated trap concentration was demonstrated.« less

  3. Time-resolved, nonequilibrium carrier dynamics in Si-on-glass thin films for photovoltaic cells

    NASA Astrophysics Data System (ADS)

    Serafini, John; Akbas, Yunus; Crandall, Lucas; Bellman, Robert; Kosik Williams, Carlo; Sobolewski, Roman

    2016-04-01

    A femtosecond pump-probe spectroscopy method was used to characterize the growth process and transport properties of amorphous silicon-on-glass, thin films, intended as absorbers for photovoltaic cells. We collected normalized transmissivity change (ΔT/T) waveforms and interpreted them using a comprehensive three-rate equation electron trapping and recombination model. Optically excited ˜300-500 nm thick Si films exhibited a bi-exponential carrier relaxation with the characteristic times varying from picoseconds to nanoseconds depending on the film growth process. From our comprehensive trapping model, we could determine that for doped and intrinsic films with very low hydrogen dilution the dominant relaxation mode was carrier trapping; while for intrinsic films with large hydrogen content and some texture, it was the standard electron-phonon cooling. In both cases, the initial nonequilibrium relaxation was followed by Shockley-Read-Hall recombination. An excellent fit between the model and the ΔT/T experimental transients was obtained and a correlation between the Si film growth process, its hydrogen content, and the associated trap concentration was demonstrated.

  4. Time-resolved, nonequilibrium carrier dynamics in Si-on-glass thin films for photovoltaic cells

    SciTech Connect

    Serafini, John; Akbas, Yunus; Crandall, Lucas; Bellman, Robert; Williams, Carlo Kosik; Sobolewski, Robert

    2016-03-02

    Here, a femtosecond pump–probe spectroscopy method was used to characterize the growth process and transport properties of amorphous silicon-on-glass, thin films, intended as absorbers for photovoltaic cells. We collected normalized transmissivity change (ΔT/T) waveforms and interpreted them using a comprehensive three-rate equation electron trapping and recombination model. Optically excited ~300–500 nm thick Si films exhibited a bi-exponential carrier relaxation with the characteristic times varying from picoseconds to nanoseconds depending on the film growth process. From our comprehensive trapping model, we could determine that for doped and intrinsic films with very low hydrogen dilution the dominant relaxation mode was carrier trapping; while for intrinsic films with large hydrogen content and some texture, it was the standard electron–phonon cooling. In both cases, the initial nonequilibrium relaxation was followed by Shockley–Read–Hall recombination. An excellent fit between the model and the ΔT/T experimental transients was obtained and a correlation between the Si film growth process, its hydrogen content, and the associated trap concentration was demonstrated.

  5. Film Thickness Influences on the Thermoelectric Properties of NiCr/NiSi Thin Film Thermocouples

    NASA Astrophysics Data System (ADS)

    Chen, Y. Z.; Jiang, H. C.; Zhang, W. L.; Liu, X. Z.; Jiang, S. W.

    2013-06-01

    NiCr/NiSi thin film thermocouples (TFTCs) with a multi-layer structure were fabricated on Ni-based superalloy substrates (95 mm × 35 mm × 2 mm) by magnetron sputtering and electron beam evaporation. The five-layer structure is composed of NiCrAlY buffer layer (2 μm), thermally grown Al2O3 bond layer (200 nm), Al2O3 insulating layer (10 μm), NiCr/NiSi TFTCs (1 μm), and Al2O3 protective layer (500 nm). Influences of thermocouple layer thickness on thermoelectric properties were investigated. Seebeck coefficient of the samples with the increase in thermocouple layer thickness from 0.5 μm to 1 μm increased from 27.8 μV/°C to 33.8 μV/°C, but exhibited almost no change with further increase in thermocouple layer thickness from 1 μm to 2 μm. Dependence on temperature of the thermal electromotive force of the samples almost followed standard thermocouple characteristic curves when the thickness of the thermocouple layer was 1 μm and 2 μm. Sensitive coefficient K of the samples increased greatly with the increase in thickness of the thermocouple layer from 0.5 μm to 1 μm, but decreased insignificantly with the increase in thermocouple layer thickness from 1 μm to 2 μm, and continuously decreased with the increase in temperature. The sensitive coefficient and the stability of NiCr/NiSi TFTCs were both improved after annealing at 600°C.

  6. Characterization of r.f. sputtered thin Mo, W and Si films as precursors to multilayer X-ray mirrors

    NASA Astrophysics Data System (ADS)

    Bhattacharyya, D.; Joseph, D.; Poswal, A. K.

    2006-08-01

    Single layers of Mo, W and Si thin films have been deposited by r.f. sputtering on float glass and c-Si substrates kept at room temperature. The films have been characterised by grazing incidence X-ray reflectometry (GIXR), X-ray transmission (XRT), Rutherford backscattering spectrometry (RBS), atomic force microscopy (AFM) and phase modulated spectroscopic ellipsometry (SE) studies. The thickness values obtained from the GIXR measurements have been used to calibrate the in situ thickness monitors. The surface roughness of the thin layers have also been determined from the GIXR measurements. The atomic mass density in the films have been obtained from the RBS measurements while X-ray absorption has been estimated from the XRT measurements. The surface morphology of the films has been investigated by the AFM micrographs. The Si thin films have also been characterized by the SE technique. The characterization of the samples by these complementary techniques have been very useful in optimizing the process parameters to obtain good quality layers as precursors to the fabrication of the multilayer X-ray mirrors based on Mo/Si and W/Si structures.

  7. Ultraviolet-infrared optical properties of highly (100)-oriented LaNiO3 thin films on Pt-Ti-SiO2-Si wafer

    NASA Astrophysics Data System (ADS)

    Yu, J.; Sun, J. L.; Meng, X. J.; Huang, Z. M.; Chu, J. H.; Tang, D. Y.; Jin, C. Y.; Li, G.; Li, W. Y.; Liang, Q.

    2001-09-01

    The optical constants of highly (100)-oriented LaNiO3 thin films on Pt(111)-Ti-SiO2-Si substrate derived by metalorganic deposition have been obtained using spectroscopic ellipsometry techniques in the wide wavelength range from ultraviolet to far infrared. In fitting the dielectric functions of LaNiO3, two harmonic oscillators are observed, one is believed to come from the valence-conduction interband transition and the other is attributed to the transition from a donor band to the conduction. Simultaneously the frequency of plasmon is also obtained, which results from the strong electron-electron interaction. Based on these optical and electrical properties, a promising application of LaNiO3 thin films in infrared microsensors has been proposed.

  8. Near zero temperature coefficient of resistance in Ti:Si:O thin films deposited by magnetron co-sputtering

    NASA Astrophysics Data System (ADS)

    Mireles, Marcela; Quevedo Lopez, M. A.

    2016-10-01

    Thin films of titanium/silicon/oxygen (Ti:Si:O) deposited by sputtering were evaluated as thin film resistors and the resulting resistance and temperature coefficient of resistance (TCR) was studied. The films were deposited in an Argon atmosphere at room temperature with 1% oxygen and their electrical properties evaluated before and after forming gas (5% H2: 95% N2) annealing at 325 and 450 °C for 1 h. The physical structure was characterized by x-ray diffraction (XRD), elemental composition and depth profile by Rutherford backscattering (RBS), and film composition by x-ray photoelectron spectroscopy (XPS). Carrier mobility, type and concentration were evaluated by Hall effect measurements. Thin films with a Ti:Si ratio of 1.6 exhibited a near zero TCR (-405 ppm °C-1) and sheet resistance (Rsh) at 25 °C of 1 kOhm sq-1.

  9. Formation of In-plane Skyrmions in Epitaxial MnSi Thin Films as Revealed by Planar Hall Effect

    NASA Astrophysics Data System (ADS)

    Yokouchi, Tomoyuki; Kanazawa, Naoya; Tsukazaki, Atsushi; Kozuka, Yusuke; Kikkawa, Akiko; Taguchi, Yasujiro; Kawasaki, Masashi; Ichikawa, Masakazu; Kagawa, Fumitaka; Tokura, Yoshinori

    2015-10-01

    We investigate skyrmion formation in both a single crystalline bulk and epitaxial thin films of MnSi by measurements of planar Hall effect. A prominent stepwise field profile of planar Hall effect is observed in the well-established skyrmion phase region in the bulk sample, which is assigned to anisotropic magnetoresistance effect with respect to the magnetic modulation direction. We also detect the characteristic planar Hall anomalies in the thin films under the in-plane magnetic field at low temperatures, which indicates the formation of skyrmion strings lying in the film plane. Uniaxial magnetic anisotropy plays an important role in stabilizing the in-plane skyrmions in the MnSi thin film.

  10. Structural and electrical properties of heterojunction devices formed by spinning TIPS Pentacene thin films on n-Si substrates

    NASA Astrophysics Data System (ADS)

    Wang, Ke; Huang, Ya; Chen, Ruofei; Xu, Zhan

    2016-12-01

    Heterojunctions were fabricated by spinning triisopropylsilyl (TIPS) Pentacene films on n-Si. The electrical transport measurements reveal that the heterojunctions possess good Schottky-type rectifying capability. The electrical parameters of the devices are derived by applying thermionic emission model. The electrical characteristics of the devices are found to be strongly related to the thickness of TIPS Pentacene film. A high barrier height demonstrated in the device formed with thin TIPS Pentacene can be explained by a low image force lowering and small roughness of the film. The large rectification ratio accompanied with the low reverse saturation current exhibited in the device with thin film may be attributed to this high barrier height formed in the junction. A depletion width in Si was estimated to be ∼860 nm in TIPS Pentacene/Si junctions from the zero-bias capacitance measured at 1 MHz.

  11. Nanograin-enhanced in-plane thermoelectric figure of merit in n-type SiGe thin films

    NASA Astrophysics Data System (ADS)

    Lu, Jianbiao; Guo, Ruiqiang; Huang, Baoling

    2016-04-01

    SiGe thin films are desirable candidates for many thermoelectric applications because of their low cost, low toxicity, and high compatibility with microelectronics fabrications. Currently, their applications are limited by their very poor thermoelectric performance. In this study, phosphorus-doped SiGe thin films with improved thermoelectric properties were grown using low pressure chemical vapor deposition, and the effects of different annealing treatments, doping concentration, composition, and temperature on their thermoelectric properties were explored. It is found that the segregation of phosphorus dopants plays an important role in grain growth and thermoelectric transport properties. The improved thermoelectric performance is mainly attributed to the significantly reduced in-plane thermal conductivity by the naturally formed nanograins. By adjusting the growth conditions, doping and post treatments, an in-plane ZT ˜ 0.16 at 300 K was obtained for the optimized n-type samples, which is even ˜50% higher than the record of bulk SiGe.

  12. Y1Ba2Cu3O(6+delta) growth on thin Y-enhanced SiO2 buffer layers on silicon

    NASA Technical Reports Server (NTRS)

    Robin, T.; Mesarwi, A.; Wu, N. J.; Fan, W. C.; Espoir, L.; Ignatiev, A.; Sega, R.

    1991-01-01

    SiO2 buffer layers as thin as 2 nm have been developed for use in the growth of Y1Ba2Cu3O(6+delta) thin films on silicon substrates. The SiO2 layers are formed through Y enhancement of silicon oxidation, and are highly stoichiometric. Y1Ba2Cu3O(6+delta) film growth on silicon with thin buffer layers has shown c orientation and Tc0 = 78 K.

  13. Suppressed magnetic order and non-Fermi-liquid behavior in MnSi thin films under hydrostatic pressure

    NASA Astrophysics Data System (ADS)

    Engelke, J.; Menzel, D.; Hidaka, H.; Seguchi, T.; Amitsuka, H.

    2014-04-01

    In MnSi thin films the magnetic properties of the B20 compound are influenced by induced uniaxial anisotropy. In comparison to bulk MnSi the critical magnetic fields are enhanced and the Skyrmion phase is found to be enlarged within the magnetic phase diagram. Furthermore the ordering temperature depends on the film thickness reaching 43 K for films of around 10 nm and is considerably higher than in bulk crystals (Tc ,bulk=29 K). In bulk MnSi the ordering temperature can be reduced by pressure, where at 1.46 GPa the magnetic order is completely suppressed and a non-Fermi-liquid behavior characterized by a T3/2 law of the resistivity is observed. We present resistance measurements on MnSi thin films under applied pressure of up to 3.44 GPa. Qualitatively, the behavior is similar to bulk MnSi. However, the critical pressure is considerably enhanced to 3.1 GPa, which is assumed to be a consequence of strain. At high pressure non-Fermi-liquid behavior evidenced by a T3/2 behavior of the resistance is observed up to Tlin=30 K, i. e., in a larger temperature range than for bulk MnSi. Uniaxial anisotropy might play an important role in this breakdown of Fermi-liquid behavior, since it stabilizes nontrivial spin structures.

  14. Passivation of Si and a-Si:H surfaces by thin oxide and oxy-nitride layers

    NASA Astrophysics Data System (ADS)

    Pinčík, E.; Kobayashi, H.; Rusnák, J.; Takahashi, M.; Brunner, R.; Jergel, M.; Morales-Acevedo, A.; Ortega, L.; Kákoš, J.

    2006-08-01

    An aim of the contribution is focused predominantly on investigation of electrical interface properties of MIS structures consisting of silicon-based substrates, which were passivated by 1.5-12 nm silicon dioxide, silicon nitride and/or silicon oxy-nitride layers. Substrates of different structural properties were used—crystalline Si (c-Si), amorphous hydrogenated silicon (a-Si:H), and silicon layer deposited by plasma enhanced chemical vapor deposition (PECVD). A stress was laid upon structures prepared on n moderately doped c-Si. The paper presents also changes of structural properties of a-Si:H surface after Ar low energy beam impact. For the first time we are presenting important results concerning utilization of X-ray diffraction with β filter in investigation of a-Si:H cluster structure. Considerable part of the contribution is devoted to investigation of electrical properties of Al/Si 3N 4/Si (2-3 nm)/GaAs structures with aim to clarify the particular effect of the ultrathin Si interlayer in the structure. Our observations indicate that the silicon interlayer can act as delta doping of GaAs and/or as quantum well. Therefore, the experimental results are compared and discussed with calculated ones obtained by application of our theoretical description of electron emission of quantum well.

  15. Photoluminescence study of wurtzite Si-doped GaN thin films

    NASA Astrophysics Data System (ADS)

    Soltani, Mohammed; Carlone, Cosmo; Charbonneau, N. Sylvain; Khanna, Shyam M.

    1998-10-01

    The photoluminescence (PL) temperature dependence of wurtzite n-type GaN thin films grown on (0001) sapphire substrates by Magnetron sputter epitaxy is reported. Samples were non-intentionally doped, lightly and highly Si-doped. The PL of non-intentionally doped samples consist of the near band edge emission and a broad yellow band (YB) near 2.2 eV. This yellow emission is equally present in spectra of all Si-doped samples. The bound exciton (D0-X) at 3.488 eV and (A0-X) at 3.456 eV are present only in the lightly Si-doped samples. The evolution of the energy position of the (D0-X) is the same as the band gap temperature variation, but the (A0-X) transition is anormally independent of the temperature in the range studied here. In both Si-doped GaN samples a peak at 3.318 eV and transitions between 3.36 and 3.39 eV are observed. The temperature dependence of the latter shows a fine structure composed of four peaks at 3.364 eV, 3.368 eV, 3.375 eV and 3.383 eV. They are tentatively attributed to the superposition of two donor-acceptor and band-acceptor transitions. This interpretation implies the presence of two donors (D1,D2) and two acceptors (A1,A2). From the energy position of the band-acceptor and the energy gap of GaN at 20 K, an acceptor ionization energy of 120 and 135 meV respectively is obtained. Assuming 10 meV for a Coulomb interaction energy of the ionized donor-acceptor pairs, a donor ionization energy of 14 and 18 meV respectively is obtained from the energy difference between the donor-acceptor and the band-acceptor positions. An activation energy of 10.8 meV is deduced from the temperature dependence of the YB. The shallow donor (about 10 meV) contributes to the mechanism of the YB.

  16. Deep ultraviolet photodetectors based on p-Si/ i-SiC/ n-Ga2O3 heterojunction by inserting thin SiC barrier layer

    NASA Astrophysics Data System (ADS)

    An, Yuehua; Zhi, Yusong; Wu, Zhenping; Cui, Wei; Zhao, Xiaolong; Guo, Daoyou; Li, Peigang; Tang, Weihua

    2016-12-01

    Deep ultraviolet photodetectors based on p-Si/ n-Ga2O3 and p-Si/ i-SiC/ n-Ga2O3 heterojunctions were fabricated by laser molecular beam epitaxial (L-MBE), respectively. In compare with p-Si/ n-Ga2O3 heterostructure-based photodetector, the dark current of p-Si/ i-SiC/ n-Ga2O3-based photodetector decreased by three orders of magnitude, and the rectifying behavior was tuned from reverse to forward. In order to improve the quality of the photodetector, we reduced the oxygen vacancies of p-Si/ i-SiC/ n-Ga2O3 heterostructures by changing the oxygen pressure during annealing. As a result, the rectification ratio ( I F/ I R) of the fabricated photodetectors was 36 at 4.5 V and the photosensitivity was 5.4 × 105% under the 254 nm light illumination at -4.5 V. The energy band structure of p-Si/ n-Ga2O3 and p-Si/ i-SiC/ n-Ga2O3 heterostructures was schematic drawn to explain the physic mechanism of enhancement of the performance of p-Si/ i-SiC/ n-Ga2O3 heterostructure-based deep UV photodetector by introduction of SiC layer.

  17. High quality epitaxial graphene by hydrogen-etching of 3C-SiC(111) thin-film on Si(111)

    NASA Astrophysics Data System (ADS)

    Mondelli, Pierluigi; Gupta, Bharati; Grazia Betti, Maria; Mariani, Carlo; Lipton Duffin, Josh; Motta, Nunzio

    2017-03-01

    Etching with atomic hydrogen, as a preparation step before the high-temperature growth process of graphene onto a thin 3C-SiC film grown on Si(111), greatly improves the structural quality of topmost graphene layers. Pit formation and island coalescence, which are typical of graphene growth by SiC graphitization, are quenched and accompanied by widening of the graphene domain sizes to hundreds of nanometers, and by a significant reduction in surface roughness down to a single substrate bilayer. The surface reconstructions expected for graphene and the underlying layer are shown with atomic resolution by scanning tunnelling microscopy. Spectroscopic features typical of graphene are measured by core-level photoemission and Raman spectroscopy.

  18. High quality epitaxial graphene by hydrogen-etching of 3C-SiC(111) thin-film on Si(111).

    PubMed

    Mondelli, Pierluigi; Gupta, Bharati; Betti, Maria Grazia; Mariani, Carlo; Duffin, Josh Lipton; Motta, Nunzio

    2017-03-17

    Etching with atomic hydrogen, as a preparation step before the high-temperature growth process of graphene onto a thin 3C-SiC film grown on Si(111), greatly improves the structural quality of topmost graphene layers. Pit formation and island coalescence, which are typical of graphene growth by SiC graphitization, are quenched and accompanied by widening of the graphene domain sizes to hundreds of nanometers, and by a significant reduction in surface roughness down to a single substrate bilayer. The surface reconstructions expected for graphene and the underlying layer are shown with atomic resolution by scanning tunnelling microscopy. Spectroscopic features typical of graphene are measured by core-level photoemission and Raman spectroscopy.

  19. Investigation of electrical, structural, and optical properties of very thin oxide/a-Si:H/c-Si interfaces passivated by cyanide treatment

    NASA Astrophysics Data System (ADS)

    Pincik, Emil; Kobayashi, Hikaru; Jurecka, Stanislav; Jergel, Matej; Gleskova, Helena; Takahashi, Masao; Brunner, Robert; Fujiwara, Naozumi; Mullerova, Jarmila

    2004-12-01

    The paper deals with investigation of electrical, structural and optical properties of very thin oxide/a-Si:H interfaces passivated by chemical treatment by KCN and HCN solutions. The oxide layers were prepared by thermal, chemical and plasma or ion beam assisted oxidations. Interface properties were evaluated by charge version of deep level transient spectroscopy, C-V measurements, X-ray diffraction (in both Bragg-Brentano and grazing incidence modes), optical reflectance (based on genetic algorithm) and photoluminescence. Considerable interest was devoted to distribution of three dominant groups of a-Si:H defect states in the band gap of the semiconductor as well as their response to bias annealing and light soaking experiments. We will present also dominant result - increase of the efficiency of a-Si:H based solar cells after chemical treatment. Finally, we will present the chemical passivation and oxidization as promising techniques suitable for applications in the field of nanotechnology.

  20. Effect of Si additions on thermal stability and the phase transition sequence of sputtered amorphous alumina thin films

    SciTech Connect

    Bolvardi, H.; Baben, M. to; Nahif, F.; Music, D. Schnabel, V.; Shaha, K. P.; Mráz, S.; Schneider, J. M.; Bednarcik, J.; Michalikova, J.

    2015-01-14

    Si-alloyed amorphous alumina coatings having a silicon concentration of 0 to 2.7 at. % were deposited by combinatorial reactive pulsed DC magnetron sputtering of Al and Al-Si (90-10 at. %) split segments in Ar/O{sub 2} atmosphere. The effect of Si alloying on thermal stability of the as-deposited amorphous alumina thin films and the phase formation sequence was evaluated by using differential scanning calorimetry and X-ray diffraction. The thermal stability window of the amorphous phase containing 2.7 at. % of Si was increased by more than 100 °C compared to that of the unalloyed phase. A similar retarding effect of Si alloying was also observed for the α-Al{sub 2}O{sub 3} formation temperature, which increased by more than 120 °C. While for the latter retardation, the evidence for the presence of SiO{sub 2} at the grain boundaries was presented previously, this obviously cannot explain the stability enhancement reported here for the amorphous phase. Based on density functional theory molecular dynamics simulations and synchrotron X-ray diffraction experiments for amorphous Al{sub 2}O{sub 3} with and without Si incorporation, we suggest that the experimentally identified enhanced thermal stability of amorphous alumina with addition of Si is due to the formation of shorter and stronger Si–O bonds as compared to Al–O bonds.

  1. [Stimulated emission characteristics of ZnO thin films deposited by magnetron sputtering on SiO2 substrates].

    PubMed

    Jing, Wang; Xi-qing, Zhang; Xiao-ying, Teng; De-ping, Xiong; Peng, Lin; Li, Wang; Shi-hua, Huang

    2004-07-01

    ZnO thin films were deposited by magnetron sputtering on SiQ2 substrates. The temperature dependence of the absorption spectra and the photoluminescence spectra was studied for ZnO thin film. The absorption of the longitudinal optical (LO) phonons and the free-excitons was observed at room temperature. The free-exciton emission was only observed in PL spectra at room temperature, the results indicate that ZnO thin films have excellent quality and low density of defects. The stimulated emission properties of ZnO thin films were investigated. When excitation intensity is above threshold, the FWHM o f stimulated emission peak increases and stimulated emission peak shows red shift with increasing excitation intensity. Our analysis shows that the optical gain is due to electronhole plasma emission.

  2. Spin Hall magnetoresistance in Co2FeSi/Pt thin films: dependence on Pt thickness and temperature

    NASA Astrophysics Data System (ADS)

    Huang, Xiufeng; Dai, Zhiwen; Huang, Lin; Lu, Guangduo; Liu, Min; Piao, Hongguang; Kim, Dong-Hyun; Yu, Seong-cho; Pan, Liqing

    2016-11-01

    We have investigated the temperature and the Pt layer thickness dependence of the magnetoresistances (MRs) in Co2FeSi/Pt thin films. Based on the field dependent measurements, it can be seen that the spin-current-induced spin Hall magnetoresistance (SMR) plays the dominant role in the MRs in the Co2FeSi/Pt bilayers in the whole temperature range. Meanwhile, a quite small part of anisotropic magnetoresistance (AMR) existed in the MRs. It proved to be originated from magnetic proximity effect (MPE) by measuring the Pt thickness and temperature dependence of the AMR. Moreover, the Co2FeSi layer thickness has much weaker effect on the SMR and AMR compared to the Pt layer thickness. These results indicate that the Co2FeSi/Pt interface is beneficial to be used in the spin-current-induced physical phenomena.

  3. Structural and optical study of Ce segregation in Ce-doped SiO{sub 1.5} thin films

    SciTech Connect

    Beainy, G.; Castro, C.; Pareige, P.; Talbot, E.; Weimmerskirch-Aubatin, J.; Stoffel, M.; Vergnat, M.; Rinnert, H.

    2015-12-21

    Cerium doped SiO{sub 1.5} thin films fabricated by evaporation and containing silicon nanocrystals were investigated by atom probe tomography. The effect of post-growth annealing treatment has been systematically studied to correlate the structural properties obtained by atom probe tomography to the optical properties measured by photoluminescence spectroscopy. The atom probe results demonstrated the formation of Ce-Si rich clusters upon annealing at 900 °C which leads to a drastic decrease of the Ce-related luminescence. At 1100 °C, pure Si nanocrystals and optically active cerium silicate compounds are formed. Consequently, the Ce-related luminescence is found to re-appear at this temperature while no Si-nanocrystal related luminescence is observed for films containing more than 3% Ce.

  4. Theoretical and empirical studies of impurity incorporation into beta-SiC thin films during epitaxial growth

    NASA Astrophysics Data System (ADS)

    Kim, H. J.; Davis, R. F.

    1986-11-01

    A theoretical determination of the vapor species present, and their respective partial pressures, is made using the SOLGASMIX-PV program for the n-type and p-type dopants of N and P, and B, respectively, under conditions used to grow monocrystalline beta-SiC thin films via CVD. The model shows that Al and P behave ideally while B and N apparently interact with the C or Si in the SiC or fill normally unoccupied interstitial positions. The relationship between the carrier concentrations or the atomic concentrations and the partial pressure of the dopant source gases is linear and parallel. The more efficient n-type and p-type dopants of N and Al have been used to produce what is suggested to be the first p-n junction diode in a beta-SiC film.

  5. Analysis of long-term internal stress and film structure of SiO2 optical thin films.

    PubMed

    Nishikawa, Toshiyuki; Ono, Hiroi; Murotani, Hiroshi; Iida, Yoshitaka; Okada, Katsuhisa

    2011-03-20

    Recently, the demand for durability of optical thin films, which have long been used, has been growing as the performance of optical components improves. The stress of a film is an important parameter that is related to its adhesion. The electron beam (EB) and ion-assisted deposition (IAD) methods are widely used to fabricate optical thin films. However, there are few reports on long-term internal stress, despite the importance of this issue. Here we discuss the time dependence of the stress of SiO2 optical thin films in terms of optical characteristics in the infrared region. It was found that SiO2 thin films prepared by the EB and IAD methods exhibited compression stress. The Si-OH molecular bond was observed at around 930 cm(-1) in the Fourier transform infrared spectroscopy spectrum of the sample prepared by the EB method, which exhibited a large change in internal stress after an elapsed time. It is considered that this change in bonding was related to the decrease in the stress of the films.

  6. Leakage current conduction and reliability assessment of passivating thin silicon dioxide films on n-4H-SiC

    NASA Astrophysics Data System (ADS)

    Samanta, Piyas; Mandal, Krishna C.

    2016-09-01

    We have analyzed the mechanisms of leakage current conduction in passivating silicon dioxide (SiO2) films grown on (0 0 0 1) silicon (Si) face of n-type 4H-SiC (silicon carbide). It was observed that the experimentally measured gate current density in metal-oxide-silicon carbide (MOSiC) structures under positive gate bias at an oxide field Eox above 5 MV/cm is comprised of Fowler-Nordheim (FN) tunneling of electrons from the accumulated n-4H-SiC and Poole-Frenkel (PF) emission of trapped electrons from the localized neutral traps in the SiO2 gap, IFN and IPF, respectively at temperatures between 27 and 200 °C. In MOSiC structures, PF mechanism dominates FN tunneling of electrons from the accumulation layer of n-4H-SiC due to high density (up to 1013 cm-2) of carbon-related acceptor-like traps located at about 2.5 eV below the SiO2 conduction band (CB). These current conduction mechanisms were taken into account in studying hole injection/trapping into 10 nm-thick tunnel oxide on the Si face of 4H-SiC during electron injection from n-4H-SiC under high-field electrical stress with positive bias on the heavily doped n-type polysilicon (n+-polySi) gate at a wide range of temperatures between 27 and 200 °C. Holes were generated in the n+-polySi anode material by the hot-electrons during their transport through thin oxide films at oxide electric fields Eox from 5.6 to 8.0 MV/cm (prior to the intrinsic oxide breakdown field). Time-to-breakdown tBD of the gate dielectric was found to follow reciprocal field (1/E) model irrespective of stress temperatures. Despite the significant amount of process-induced interfacial electron traps contributing to a large amount of leakage current via PF emission in thermally grown SiO2 on the Si-face of n-4H-SiC, MOSiC devices having a 10 nm-thick SiO2 film can be safely used in 5 V TTL logic circuits over a period of 10 years.

  7. Synthesis of silver nanoparticles by chemical reduction method and its metal induced crystallization of poly-Si thin film application

    NASA Astrophysics Data System (ADS)

    Huang, Jung-Jie; Lin, Che-Chun; Wuu, Dong-Sing

    2014-12-01

    Metal induced crystallization (MIC) can be generated by using a silver nanoparticles (AgNPs) solution spin coated on amorphous silicon (a-Si) film, and annealing the sample in a furnace under vacuum. Because nanoscale metal has a large specific surface area, its catalytic effect is enhanced, resulting in a low processing temperature. Thus, a poly-Si thin film with a high crystalline fraction can be obtained by using AgNPs induced crystallization. In this study, the size and annealing time of AgNPs are discussed. According to the results, the grain size of the poly-Si thin film produced using AgNPs induced crystallization was more uniform than that of the film obtained by employing traditional thermally evaporated Ag induced crystallization. Smaller AgNPs size and long annealing time enhance the crystallization of poly-Si thin film. Applying an annealing temperature of 550 °C for 480 min with 10 nm of AgNPs yielded a crystalline fraction of 75%.

  8. Fabrication of bright and thin Zn₂SiO₄ luminescent film for electron beam excitation-assisted optical microscope.

    PubMed

    Furukawa, Taichi; Kanamori, Satoshi; Fukuta, Masahiro; Nawa, Yasunori; Kominami, Hiroko; Nakanishi, Yoichiro; Sugita, Atsushi; Inami, Wataru; Kawata, Yoshimasa

    2015-07-13

    We fabricated a bright and thin Zn₂SiO₄ luminescent film to serve as a nanometric light source for high-spatial-resolution optical microscopy based on electron beam excitation. The Zn₂SiO₄ luminescent thin film was fabricated by annealing a ZnO film on a Si₃N₄ substrate at 1000 °C in N₂. The annealed film emitted bright cathodoluminescence compared with the as-deposited film. The film is promising for nano-imaging with electron beam excitation-assisted optical microscopy. We evaluated the spatial resolution of a microscope developed using this Zn₂SiO₄ luminescent thin film. This is the first report of the investigation and application of ZnO/Si₃N₄ annealed at a high temperature (1000 °C). The fabricated Zn₂SiO₄ film is expected to enable high-frame-rate dynamic observation with ultra-high resolution using our electron beam excitation-assisted optical microscopy.

  9. The mechanism of electromigration failure of narrow Al-2Cu-1Si thin-film interconnects

    SciTech Connect

    Kim, C.; Morris, J.W. Jr. )

    1993-05-15

    This work is principally concerned with the microstructure of electromigration failure in narrow Al-2Cu-1Si conducting lines on Si. Samples were patterned from 0.5-[mu]m-thick vapor-deposited films with mean grain size of 2.4 [mu]m, and had linewidths of 1.3 [mu]m ([ital W]/[ital G][approx]0.5), 2 [mu]m ([ital W]/[ital G][approx]0.8), and 6 [mu]m ([ital W]/[ital G][approx]2.5). The lines were tested to failure at [ital T]=226 [degree]C and [ital j]=2.5[times]10[sup 6] A/cm[sup 2]. Other samples were tested over a range of substrate temperatures and current densities to test the effect of these variables, and 1.3 [mu]m lines were tested after preaging at 226 [degree]C for various times to change the Cu-precipitate distribution prior to testing. Three failure modes were observed: The 6 [mu]m specimens failed by separation along grain boundaries with an apparent activation energy of 0.65 eV; the 1.3 [mu]m specimens that were preaged for 24 h failed after very long times by gradual thinning to rupture; all other narrow lines failed by the transgranular-slit mechanism with an activation energy near 0.93 eV. Microstructural studies suggest that the transgranular-slit failure mechanism is due to the accumulation of a supersaturation of vacancies in the bamboo grains that terminate polygranular segments in the line. Failure occurs after Cu has been swept from the grain that fails. Failure happens first at the end of the longest polygranular segment of the line, at a time that decreases exponentially with the polygranular segment length. Preaging the line to create a more stable distribution of Cu lengthens the time required to sweep Cu from the longest polygranular segment, and significantly increases the time to failure. In the optimal case the transgranular-slit failure mechanism is suppressed, and the bamboo grain fails by diffuse thinning to rupture.

  10. Fabrication and characterization of Al{sub 2}O{sub 3} /Si composite nanodome structures for high efficiency crystalline Si thin film solar cells

    SciTech Connect

    Zhang, Ruiying; Zhu, Jian; Zhang, Zhen; Wang, Yanyan; Qiu, Bocang; Liu, Xuehua; Zhang, Jinping; Zhang, Yi; Fang, Qi; Ren, Zhong; Bai, Yu

    2015-12-15

    We report on our fabrication and characterization of Al{sub 2}O{sub 3}/Si composite nanodome (CND) structures, which is composed of Si nanodome structures with a conformal cladding Al{sub 2}O{sub 3} layer to evaluate its optical and electrical performance when it is applied to thin film solar cells. It has been observed that by application of Al{sub 2}O{sub 3}thin film coating using atomic layer deposition (ALD) to the Si nanodome structures, both optical and electrical performances are greatly improved. The reflectivity of less than 3% over the wavelength range of from 200 nm to 2000 nm at an incident angle from 0° to 45° is achieved when the Al{sub 2}O{sub 3} film is 90 nm thick. The ultimate efficiency of around 27% is obtained on the CND textured 2 μm-thick Si solar cells, which is compared to the efficiency of around 25.75% and 15% for the 2 μm-thick Si nanodome surface-decorated and planar samples respectively. Electrical characterization was made by using CND-decorated MOS devices to measure device’s leakage current and capacitance dispersion. It is found the electrical performance is sensitive to the thickness of the Al{sub 2}O{sub 3} film, and the performance is remarkably improved when the dielectric layer thickness is 90 nm thick. The leakage current, which is less than 4x10{sup −9} A/cm{sup 2} over voltage range of from -3 V to 3 V, is reduced by several orders of magnitude. C-V measurements also shows as small as 0.3% of variation in the capacitance over the frequency range from 10 kHz to 500 kHz, which is a strong indication of surface states being fully passivated. TEM examination of CND-decorated samples also reveals the occurrence of SiO{sub x} layer formed between the interface of Si and the Al{sub 2}O{sub 3} film, which is thin enough that ensures the presence of field-effect passivation, From our theoretical and experimental study, we believe Al{sub 2}O{sub 3} coated CND structures is a truly viable approach to achieving higher device

  11. Fabrication and characterization of Al2O3 /Si composite nanodome structures for high efficiency crystalline Si thin film solar cells

    NASA Astrophysics Data System (ADS)

    Zhang, Ruiying; Zhu, Jian; Zhang, Zhen; Wang, Yanyan; Qiu, Bocang; Liu, Xuehua; Zhang, Jinping; Zhang, Yi; Fang, Qi; Ren, Zhong; Bai, Yu

    2015-12-01

    We report on our fabrication and characterization of Al2O3/Si composite nanodome (CND) structures, which is composed of Si nanodome structures with a conformal cladding Al2O3 layer to evaluate its optical and electrical performance when it is applied to thin film solar cells. It has been observed that by application of Al2O3thin film coating using atomic layer deposition (ALD) to the Si nanodome structures, both optical and electrical performances are greatly improved. The reflectivity of less than 3% over the wavelength range of from 200 nm to 2000 nm at an incident angle from 0° to 45° is achieved when the Al2O3 film is 90 nm thick. The ultimate efficiency of around 27% is obtained on the CND textured 2 μm-thick Si solar cells, which is compared to the efficiency of around 25.75% and 15% for the 2 μm-thick Si nanodome surface-decorated and planar samples respectively. Electrical characterization was made by using CND-decorated MOS devices to measure device's leakage current and capacitance dispersion. It is found the electrical performance is sensitive to the thickness of the Al2O3 film, and the performance is remarkably improved when the dielectric layer thickness is 90 nm thick. The leakage current, which is less than 4x10-9 A/cm2 over voltage range of from -3 V to 3 V, is reduced by several orders of magnitude. C-V measurements also shows as small as 0.3% of variation in the capacitance over the frequency range from 10 kHz to 500 kHz, which is a strong indication of surface states being fully passivated. TEM examination of CND-decorated samples also reveals the occurrence of SiOx layer formed between the interface of Si and the Al2O3 film, which is thin enough that ensures the presence of field-effect passivation, From our theoretical and experimental study, we believe Al2O3 coated CND structures is a truly viable approach to achieving higher device efficiency.

  12. Opto-electronic properties of P-doped nc-Si-QD/a-SiC:H thin films as foundation layer for all-Si solar cells in superstrate configuration

    NASA Astrophysics Data System (ADS)

    Kar, Debjit; Das, Debajyoti

    2016-07-01

    With the advent of nc-Si solar cells having improved stability, the efficient growth of nc-Si i-layer of the top cell of an efficient all-Si solar cell in the superstrate configuration prefers nc-Si n-layer as its substrate. Accordingly, a wide band gap and high conducting nc-Si alloy material is a basic requirement at the n-layer. Present investigation deals with the development of phosphorous doped n-type nanocrystalline silicon quantum dots embedded in hydrogenated amorphous silicon carbide (nc-Si-QD/a-SiC:H) hetero-structure films, wherein the optical band gap can be widened by the presence of Si-C bonds in the amorphous matrix and the embedded high density tiny nc-Si-QDs could provide high electrical conductivity, particularly in P-doped condition. The nc-Si-QDs simultaneously facilitate further widening of the optical band gap by virtue of the associated quantum confinement effect. A complete investigation has been made on the electrical transport phenomena involving charge transfer by tunneling and thermionic emission prevailing in n-type nc-Si-QD/a-SiC:H thin films. Their correlation with different phases of the specific heterostructure has been carried out for detailed understanding of the material, in order to improve its device applicability. The n-type nc-Si-QD/a-SiC:H films exhibit a thermally activated electrical transport above room temperature and multi-phonon hopping (MPH) below room temperature, involving defects in the amorphous phase and the grain-boundary region. The n-type nc-Si-QD/a-SiC:H films grown at ˜300 °C, demonstrating wide optical gap ˜1.86-1.96 eV and corresponding high electrical conductivity ˜4.5 × 10-1-1.4 × 10-2 S cm-1, deserve to be an effective foundation layer for the top nc-Si sub-cell of all-Si solar cells in n-i-p structure with superstrate configuration.

  13. X-ray diffraction Microscopy of Bi2 Se3 thin film on graphene/SiC

    NASA Astrophysics Data System (ADS)

    Laanait, Nouamane; Zhang, Zhan; Fenter, Paul

    2014-03-01

    We present an x-ray diffraction microscopy study of a thin film of Bi2Se3 on epitaxial graphene/6H-SiC(001). The Bi2Se3 thin film, consisting of 30 quintuple layers (Se-Bi-Se-Bi-Se), is a topological insulator that was grown by molecular beam epitaxy. The x-ray microscope resolves the lateral distribution of the film thickness at the sub-100 nm scale with the contrast produced by the thin film diffraction signal. Utilizing the depth penetration of x-rays, we imaged the buried interfaces in this system, to probe the correlation between the structure and topography of the supporting interfaces and the growth of the thin film. We find that the Bi2Se3 thickness distribution closely follows the underlying substrate topography and is strongly affected by the inhomogeneous distribution of graphene near the steps of SiC, whereby nucleation induces the growth of a large number of carbon layers. High-resolution surface diffraction was also measured from this system to extract the atomic positions in the thin film to investigate the transition from graphene to Bi2Se3.

  14. KCl ultra-thin films with polar and non-polar surfaces grown on Si(111)7 × 7

    PubMed Central

    Beinik, Igor; Barth, Clemens; Hanbücken, Margrit; Masson, Laurence

    2015-01-01

    The growth of ultra-thin KCl films on the Si(111)7 × 7 reconstructed surface has been investigated as a function of KCl coverage and substrate temperature. The structure and morphology of the films were characterized by means of scanning tunneling microscopy (STM) under ultra-high vacuum (UHV) conditions. Detailed analysis of the atomically resolved STM images of islands grown at room and high temperatures (400 K–430 K) revealed the presence of KCl(001) and KCl(111) islands with the ratio between both structures depending on the growth temperature. At room temperature, the growth of the first layer, which covers the initial Si(111)7 × 7 surface, contains double/triple atomic layers of KCl(001) with a small fraction of KCl(111) islands. The high temperature growth promotes the appearance of large KCl(111) areas, which are built up by three atomic layers. At room and high temperatures, flat and atomically well-defined ultra-thin KCl films can be grown on the Si(111)7 × 7 substrate. The formation of the above mentioned (111) polar films is interpreted as a result of the thermally activated dissociative adsorption of KCl molecules on Si(111)7 × 7, which produces an excess of potassium on the Si surface. PMID:25650038

  15. XPS investigation of thin SiO x and SiO xN y overlayers

    NASA Astrophysics Data System (ADS)

    Birer, Ö.; Sayan, Ş.; Süzer, Ş.; Aydınlı, A.

    1999-05-01

    Angle-resolved XPS is used to determine the thickness and the uniformity of the chemical composition with respect to oxygen and nitrogen of the very thin silicon oxide and oxynitride overlayers grown on silicon.

  16. Patterned ion beam implantation of Co ions into a SiO2 thin film via ordered nanoporous alumina masks.

    PubMed

    Guan, Wei; Ghatak, Jay; Peng, Yong; Peng, Nianhua; Jeynes, Chris; Inkson, Beverley; Möbus, Günter

    2012-02-03

    Spatially patterned ion beam implantation of 190 keV Co(+) ions into a SiO(2) thin film on a Si substrate has been achieved by using nanoporous anodic aluminum oxide with a pore diameter of 125 nm as a mask. The successful synthesis of periodic embedded Co regions using pattern transfer is demonstrated for the first time using cross-sectional (scanning) transmission electron microscopy (TEM) in combination with analytical TEM. Implanted Co regions are found at the correct relative lateral periodicity given by the mask and at a depth of about 120 nm.

  17. Band gap tuning of epitaxial SrTiO{sub 3-δ}/Si(001) thin films through strain engineering

    SciTech Connect

    Cottier, Ryan J.; Steinle, Nathan A.; Currie, Daniel A.; Theodoropoulou, Nikoleta

    2015-11-30

    We investigate the effect of strain and oxygen vacancies (V{sub O}) on the crystal and optical properties of oxygen deficient, ultra-thin (4–30 nm) films of SrTiO{sub 3-δ} (STO) grown heteroepitaxially on p-Si(001) substrates by molecular beam epitaxy. We demonstrate that STO band gap tuning can be achieved through strain engineering and show that the energy shift of the direct energy gap transition of SrTiO{sub 3-δ}/Si films has a quantifiable dimensional and doping dependence that correlates well with the changes in crystal structure.

  18. Technology demonstration of a novel poly-Si nanowire thin film transistor

    NASA Astrophysics Data System (ADS)

    Liu, Libin; Liang, Renrong; Shan, Bolin; Xu, Jun; Wang, Jing

    2016-11-01

    A simple process flow method for the fabrication of poly-Si nanowire thin film transistors (NW-TFTs) without advanced lithographic tools is introduced in this paper. The cross section of the nanowire channel was manipulated to have a parallelogram shape by combining a two-step etching process and a spacer formation technique. The electrical and temperature characteristics of the developed NW-TFTs are measured in detail and compared with those of conventional planar TFTs (used as a control). The as-demonstrated NW-TFT exhibits a small subthreshold swing (191 mV/dec), a high ON/OFF ratio (8.5 × 107), a low threshold voltage (1.12 V), a decreased OFF-state current, and a low drain-induced-barrier lowering value (70.11 mV/V). The effective trap densities both at the interface and grain boundaries are also significantly reduced in the NW-TFT. The results show that all improvements of the NW-TFT originate from the enhanced gate controllability of the multi-gate over the channel. Project supported by the National Key Research and Development Program of China (Grant Nos. 2016YFA0302300 and 2016YFA0200404), the National Natural Science Foundation of China (Grant No. 61306105), the National Science and Technology Major Project of China (Grant No. 2011ZX02708-002), the Tsinghua University Initiative Scientific Research Program, China and the Tsinghua National Laboratory for Information Science and Technology (TNList) Cross-discipline Foundation, China.

  19. Si Passivation and Chemical Vapor Deposition of Silicon Nitride: Final Technical Report, March 18, 2007

    SciTech Connect

    Atwater, H. A.

    2007-11-01

    This report investigated chemical and physical methods for Si surface passivation for application in crystalline Si and thin Si film photovoltaic devices. Overall, our efforts during the project were focused in three areas: i) synthesis of silicon nitride thin films with high hydrogen content by hot-wire chemical vapor deposition; ii) investigation of the role of hydrogen passivation of defects in crystalline Si and Si solar cells by out diffusion from hydrogenated silicon nitride films; iii) investigation of the growth kinetics and passivation of hydrogenated polycrystalline. Silicon nitride films were grown by hot-wire chemical vapor deposition and film properties have been characterized as a function of SiH4/NH3 flow ratio. It was demonstrated that hot-wire chemical vapor deposition leads to growth of SiNx films with controllable stoichiometry and hydrogen.

  20. Molybdenum Silicide Formation on Single Crystal, Polycrystalline and Amorphous Silicon: Growth, Structure and Electrical Properties

    NASA Astrophysics Data System (ADS)

    Doland, Charles Michael

    The solid state reactions that occur between a thin metal film and a silicon substrate are of scientific and technological interest. The initial interactions are poorly understood, yet the final state may critically depend on the initial interactions. In this work, the reactions of thin molybdenum films on amorphous, polycrystalline, and single crystal silicon substrates were studied, with an emphasis on the initial interdiffusion and the nucleation of the crystalline silicide phase. Our research was carried out in an ultrahigh vacuum (UHV) system in order to minimize effects of contaminants. In situ Raman scattering and Auger electron spectroscopy were used to probe the structure and composition of the films. Electron microscopy, low energy electron diffraction and Schottky barrier height measurements were used to obtain additional information. The hexagonal phase of the disilicide (h-MoSi _2) is the first phase formed. This occurs after 30 minute annealing at 400^ circC on clean samples. Impurities interfere with this reaction, but substrate crystallinity has no effect. The hexagonal phase transforms to the tetragonal phase (t-MoSi_2) after 800 ^circC annealing for all substrate types. Contamination retards this reaction, resulting in films containing both phases. For the thin films in this study, the transformation to t-MoSi_2 is accompanied by agglomeration of the films. From bulk thermodynamics, t-MoSi_2 is expected to be the first phase formed, but h -MoSi_2 is the first phase observed. This phase nucleates before t-MoSi_2, due to a lower silicide-silicon interfacial energy. Detailed knowledge of interfacial energies and effects of impurities are required to understand the initial phases of thin film solid state reactions.

  1. Effects of Thermal Annealing on the Thermoelectric and Optical Properties of SiO2/SiO2+Cu Nanolayer Thin Films

    NASA Astrophysics Data System (ADS)

    Budak, S.; Baker, M.; Lassiter, J.; Smith, C.; Muntele, C.; Johnson, R. B.

    2015-06-01

    We have prepared multi-nanolayer superlattice thin-film systems comprising 36 alternating layers of SiO2 and SiO2+Cu nanolayers, of total thickness approximately 300 nm, by magnetron direct current-radio frequency sputtering. To modify their thermoelectric and optical properties, the films were placed in a furnace for annealing at temperatures between 500°C and 700°C, in air, for 1 h, to form quantum nano-dots and/or quantum clusters. Atomic force microscopy was used to analyze the surface of the thin-film systems. The thermoelectric and optical properties of the systems were characterized by study of ultraviolet-visible-near infrared absorption, fluorescence, and Raman spectroscopy, and by measurement of Seebeck coefficients. Seebeck coefficients increased from -70 μV/K to -100 μV/K when the temperature was increased from 0°C to 700°C. Optical absorption spectra showed that formation of nano-dots and/or nano-clustering also occurred as the temperature was increased. Thermal annealing affected the optical and thermal properties of the multi-nanolayer thermoelectric thin-film systems in the positive direction.

  2. Effects of Thermal Annealing on the Thermoelectric and Optical Properties of SiO2/SiO2+Cu Nanolayer Thin Films

    NASA Astrophysics Data System (ADS)

    Budak, S.; Baker, M.; Lassiter, J.; Smith, C.; Muntele, C.; Johnson, R. B.

    2014-09-01

    We have prepared multi-nanolayer superlattice thin-film systems comprising 36 alternating layers of SiO2 and SiO2+Cu nanolayers, of total thickness approximately 300 nm, by magnetron direct current-radio frequency sputtering. To modify their thermoelectric and optical properties, the films were placed in a furnace for annealing at temperatures between 500°C and 700°C, in air, for 1 h, to form quantum nano-dots and/or quantum clusters. Atomic force microscopy was used to analyze the surface of the thin-film systems. The thermoelectric and optical properties of the systems were characterized by study of ultraviolet-visible-near infrared absorption, fluorescence, and Raman spectroscopy, and by measurement of Seebeck coefficients. Seebeck coefficients increased from -70 μV/K to -100 μV/K when the temperature was increased from 0°C to 700°C. Optical absorption spectra showed that formation of nano-dots and/or nano-clustering also occurred as the temperature was increased. Thermal annealing affected the optical and thermal properties of the multi-nanolayer thermoelectric thin-film systems in the positive direction.

  3. Low temperature formation of shallow p{sup +}n junctions by BF{sub 2}{sup +} implantation into thin Pd{sub 2}Si films on Si substrates

    SciTech Connect

    Lin, C.T.; Ma, K.P.; Chou, P.F.; Cheng, H.C.

    1995-05-01

    Excellent silicided shallow p{sup +}n junctions have been successfully achieved by the implantation of BF{sub 2}{sup +} ions into thin Pd{sub 2}Si films on Si substrates to a dose of 5 {times} 10{sup 15} cm{sup {minus}2} and subsequent low temperature (even at 550 C) furnace annealing. The formed junctions have been characterized for respective implantation conditions. In this experiment, the implant energy is the key role in obtaining a low leakage diode. Reverse current density of about 3 nA/cm{sup 2} and an ideality factor of about 1.05 can be attained by the implantation of BF{sub 2}{sup +} ions at 80 keV and subsequent annealing at 550 C. The junction depth is about 0.09 {mu}m, measured by the spread resistance method. As compared with the results of unimplanted specimens, the implantation of BF{sub 2}{sup +} ions into a thin Pd{sub 2}Si layer can stabilize the silicide film and prevent it from forming islands during high temperature annealing.

  4. Investigation of interface property in Al/SiO2/ n-SiC structure with thin gate oxide by illumination

    NASA Astrophysics Data System (ADS)

    Chang, P. K.; Hwu, J. G.

    2017-04-01

    The reverse tunneling current of Al/SiO2/ n-SiC structure employing thin gate oxide is introduced to examine the interface property by illumination. The gate current at negative bias decreases under blue LED illumination, yet increases under UV lamp illumination. Light-induced electrons captured by interface states may be emitted after the light sources are off, leading to the recovery of gate currents. Based on transient characteristics of gate current, the extracted trap level is close to the light energy for blue LED, indicating that electron capture induced by lighting may result in the reduction of gate current. Furthermore, bidirectional C- V measurements exhibit a positive voltage shift caused by electron trapping under blue LED illumination, while a negative voltage shift is observed under UV lamp illumination. Distinct trapping and detrapping behaviors can be observed from variations in I- V and C- V curves utilizing different light sources for 4H-SiC MOS capacitors with thin insulators.

  5. Growth Behavior of Ga-Doped ZnO Thin Films Deposited on Au/SiN/Si(001) Substrates by Radio Frequency Magnetron Sputtering

    NASA Astrophysics Data System (ADS)

    Seo, Seon Hee; Kang, Hyon Chol

    2013-11-01

    This paper reports the growth behavior of Ga-doped ZnO (ZnO:Ga) thin films deposited on Au/SiN/Si(001) substrates by radio-frequency magnetron sputtering. The microstructures of the overgrown ZnO:Ga thin films were investigated by performing X-ray diffraction, scanning electron microcopy, and transmission electron microscopy analyses. It was confirmed that the growth process proceeds through three stages. In the first stage, nano-scale ZnO:Ga islands were grown on the SiN layer, while a fairly continuous flat structure was formed on the Au nanoparticles (NPs). In the second stage of the growth process, ZnO:Ga domains with different growth orientations, depending strongly on the crystalline planes of the host Au NPs, were nucleated. These domains then grew at different rates, resulting in a change in the morphology from the initial shape reflecting that of the Au NPs to a sunflower-type shape. In the final stage, columnar growth with a preferred (0002) orientation along the surface normal direction became dominant.

  6. Material properties of pulsed-laser crystallized Si thin films grown on yttria-stabilized zirconia crystallization-induction layers by two-step irradiation method

    NASA Astrophysics Data System (ADS)

    Thi Kieu Lien, Mai; Horita, Susumu

    2016-03-01

    Amorphous Si thin films on yttria-stabilized zirconia (YSZ) layers were crystallized widely in solid phase by the two-step method with a pulsed laser, moving the sample stage. The crystalline quality, impurity diffusion, and electrical properties of the crystallized Si films were investigated. It was found that the crystallinity of the Si thin films was improved and their surface was smooth without an incubation layer at the interface, indicating the uniform crystallinity of Si on YSZ. The diffusion of Zr and Y into the Si thin films was as small as or smaller than the order of 1017 atoms/cm3. We evaluated the electrical properties of carrier concentration and Hall mobility of the Si thin films with/without YSZ layers by using the resistivity and AC Hall effect measurements. The temperature and doping concentration dependences were measured for both undoped and P-doped films. It was found that both the undoped and P-doped Si/YSZ/glass films showed higher mobilities and carrier concentrations (and therefore higher conductivities), which indicate a smaller number of defects, than the Si/glass films. This suggested that the Si film crystallized on the YSZ layer is more suitable for application to electronic devices than the Si film on glass.

  7. A comparative study of the microstructural and magnetic properties of <1 1 0> textured thin polycrystalline Fe100-xGax (10 ≤ x ≤ 35) films

    NASA Astrophysics Data System (ADS)

    Javed, A.; Morley, N. A.; Szumiata, T.; Gibbs, M. R. J.

    2011-05-01

    In this work, we present a detailed analysis of the microstructure and magnetic properties of 50 ± 2 nm thick polycrystalline Fe 100- xGa x (10 ≤ x ≤ 35) films. Two sets of Fe 100- xGa x films were fabricated on Si 1 0 0 substrates with and without a forming field Hf present. Microstructural properties were studied using X-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDS) and conversion electron Mössbauer spectroscopy (CEMS). Magnetic properties were studied using the magneto optical Kerr effect (MOKE) magnetometer. For all films, the 1 1 0 texture normal to the film plane was observed from XRD. No peaks corresponding to the ordered D0 3 or L1 2 phases were observed from XRD. Using CEMS, the disordered A2 phase was confirmed in all films. It was found that the magnetostriction in Set-1 (forming field Hf = 0) films was ˜40-50% higher compared to the Set-2 ( Hf ≠ 0) films over the whole Ga composition range studied. Both film sets have a strong dependence of saturation field H s on Ga composition. Set-1 films were magnetically isotropic but a weak uniaxial anisotropy was observed in Set-2 films. The saturation field H s in Set-2 films was significantly lower compared to the Set-1 films. It was concluded that the H f reduced H s but also reduced effective saturation magnetostriction constant λeff in the films.

  8. Preparation and characterization of transparent hydrophilic photocatalytic TiO2/SiO2 thin films on polycarbonate.

    PubMed

    Fateh, Razan; Dillert, Ralf; Bahnemann, Detlef

    2013-03-19

    Transparent hydrophilic photocatalytic TiO2 coatings have been widely applied to endow the surfaces self-cleaning properties. A mixed metal oxide (TiO2/SiO2) can enhance the photocatalytic performance improving the ability of surface adsorption and increasing the amount of hydroxyl surface groups. The present work introduces a systematic study concerning the effect of the SiO2 addition to TiO2 films on the wettability, the photocatalytic activity, the adhesion strength, and the mechanical stability of the films. Transparent hydrophilic photocatalytic TiO2/SiO2 thin films were used to coat the polycarbonate (PC) substrate which was precoated by an intermediate SiO2 layer. The TiO2/SiO2 thin film was prepared employing a bulk TiO2 powder (Sachtleben Hombikat UV 100) and different molar ratios of tetraethoxysilane in acidic ethanol. A dip-coating process was used to deposit the films onto the polycarbonate substrate. The films were characterized by UV/vis spectrophotometry, FTIR spectroscopy, ellipsometry, BET, AFM, XRD, and water contact angle measurements. The mechanical stability and the UV resistance were examined. The photocatalytic activity of the coated surface was calculated from the kinetic analysis of methylene blue photodegradation measurements and compared with the photocatalytic activity of Pilkington Activ sheet glass. The coated surfaces displayed considerable photocatalytic activity and superhydrophilicity after exposure to UV light. The addition of SiO2 results in an improvement of the photocatalytic activity of the TiO2 film reaching the highest value at molar ratio TiO2/SiO2 equal to 1:0.9. The prepared films exhibit a good stability against UV(A) irradiation.

  9. Time-integrated photoluminescence and pump-probe reflection spectroscopy of Si doped InN thin films

    SciTech Connect

    Mohanta, Antaryami; Jang, Der-Jun Wang, Ming-Sung; Tu, L. W.

    2014-01-28

    Temperature and excitation power dependent time-integrated photoluminescence of Si doped InN thin films are investigated. Photoluminescence (PL) spectra at low temperatures are described by single emission peak ensued due to “free-to-bound” recombination; whereas PL spectra at higher temperatures above 150 K are characterized by both “band-to-band” and “free-to-bound” transition. Carrier dynamics of Si doped InN thin films is studied using pump-probe reflection spectroscopy at room temperature. The hot electron cooling process is well described by electron-electron scattering. The dependence of the hot electron cooling rate on total electron density shows sublinear to linear behavior with increase of background electron density. The variation of the carrier recombination lifetime with total electron density implicates the dominance of the defect-related nonradiative recombination channel over other recombination processes.

  10. Hybrid ZnO nanowire/a-Si:H thin-film radial junction solar cells using nanoparticle front contacts

    SciTech Connect

    Pathirane, M. Iheanacho, B.; Lee, C.-H.; Wong, W. S.; Tamang, A.; Knipp, D.; Lujan, R.

    2015-10-05

    Hydrothermally synthesized disordered ZnO nanowires were conformally coated with a-Si:H thin-films to fabricate three dimensional hybrid nanowire/thin-film structures. The a-Si:H layer formed a radial junction p-i-n diode solar cell around the ZnO nanowire. The cylindrical hybrid solar cells enhanced light scattering throughout the UV-visible-NIR spectrum (300 nm–800 nm) resulting in a 22% increase in short-circuit current density compared to the reference planar p-i-n device. A fill factor of 69% and a total power conversion efficiency of 6.5% were achieved with the hybrid nanowire solar cells using a spin-on indium tin oxide nanoparticle suspension as the top contact.

  11. Polishing of polycrystalline diamond films

    NASA Astrophysics Data System (ADS)

    Harker, Alan B.; Flintoff, John F.; DeNatale, Jeffrey F.

    1990-12-01

    Optically smooth surfaces can be produced on initially rough polycrystalline diamond film through the combined use of reactive ion etching and high temperature lapping on Fe metai Protective thin film barriers are first applied to the diamond surface to restrict the reactiv oxygen or hydrogen ion etching process to regions of greatest roughness. When the overaJ surface roughness has been reduced sufficiently by etching mechanical lapping of the surfac on an Fe plate at temperatures of 730C-900C in the presence of hydrogen can be used t produce surface roughnesses of less than 10 nm as measured by profilimetry. The tw techniques are complementary for flat surfaces while the reactive etching process alone can b used with shaped substrates to produce a surface finish suitable for LWIR optical applications. 1.

  12. Low cost back contact heterojunction solar cells on thin c-Si wafers. integrating laser and thin film processing for improved manufacturability

    SciTech Connect

    Hegedus, Steven S.

    2015-09-08

    An interdigitated back contact (IBC) Si wafer solar cell with deposited a-Si heterojunction (HJ) emitter and contacts is considered the ultimate single junction Si solar cell design. This was confirmed in 2014 by both Panasonic and Sharp Solar producing IBC-HJ cells breaking the previous record Si solar cell efficiency of 25%. But manufacturability at low cost is a concern for the complex IBC-HJ device structure. In this research program, our goals were to addressed the broad industry need for a high-efficiency c-Si cell that overcomes the dominant module cost barriers by 1) developing thin Si wafers synthesized by innovative, kerfless techniques; 2) integrating laser-based processing into most aspects of solar cell fabrication, ensuring high speed and low thermal budgets ; 3) developing an all back contact cell structure compatible with thin wafers using a simplified, low-temperature fabrication process; and 4) designing the contact patterning to enable simplified module assembly. There were a number of significant achievements from this 3 year program. Regarding the front surface, we developed and applied new method to characterize critical interface recombination parameters including interface defect density Dit and hole and electron capture cross-section for use as input for 2D simulation of the IBC cell to guide design and loss analysis. We optimized the antireflection and passivation properties of the front surface texture and a-Si/a-SiN/a-SiC stack depositions to obtain a very low (< 6 mA/cm2) front surface optical losses (reflection and absorption) while maintaining excellent surface passivation (SRV<5 cm/s). We worked with kerfless wafer manufacturers to apply defect-engineering techniques to improve bulk minority-carrier lifetime of thin kerfless wafers by both reducing initial impurities during growth and developing post-growth gettering techniques. This led insights about the kinetics of nickel, chromium, and dislocations in PV-grade silicon and to

  13. Low cost back contact heterojunction solar cells on thin c-Si wafers. Integrating laser and thin film processing for improved manufacturability

    SciTech Connect

    Hegedus, Steven S.

    2015-09-08

    An interdigitated back contact (IBC) Si wafer solar cell with deposited a-Si heterojunction (HJ) emitter and contacts is considered the ultimate single junction Si solar cell design. This was confirmed in 2014 by both Panasonic and Sharp Solar producing IBC-HJ cells breaking the previous record Si solar cell efficiency of 25%. But manufacturability at low cost is a concern for the complex IBC-HJ device structure. In this research program, our goals were to addressed the broad industry need for a high-efficiency c-Si cell that overcomes the dominant module cost barriers by 1) developing thin Si wafers synthesized by innovative, kerfless techniques; 2) integrating laser-based processing into most aspects of solar cell fabrication, ensuring high speed and low thermal budgets ; 3) developing an all back contact cell structure compatible with thin wafers using a simplified, low-temperature fabrication process; and 4) designing the contact patterning to enable simplified module assembly. There were a number of significant achievements from this 3 year program. Regarding the front surface, we developed and applied new method to characterize critical interface recombination parameters including interface defect density Dit and hole and electron capture cross-section for use as input for 2D simulation of the IBC cell to guide design and loss analysis. We optimized the antireflection and passivation properties of the front surface texture and a-Si/a-SiN/a-SiC stack depositions to obtain a very low (< 6 mA/cm2) front surface optical losses (reflection and absorption) while maintaining excellent surface passivation (SRV<5 cm/s). We worked with kerfless wafer manufacturers to apply defect-engineering techniques to improve bulk minority-carrier lifetime of thin kerfless wafers by both reducing initial impurities during growth and developing post-growth gettering techniques. This led insights about the kinetics of nickel, chromium, and dislocations in PV-grade silicon and to

  14. Defect induced phonon scattering for tuning the lattice thermal conductivity of SiO2 thin films

    NASA Astrophysics Data System (ADS)

    Cao, Sen; He, Hu; Zhu, Wenhui

    2017-01-01

    In this work, the thermal properties of nanoscale SiO2 thin films have been systematically investigated with respect to the thickness, crystal orientations and the void defects using non-equilibrium molecular-dynamics (NEMD) simulation. Size effect for the lattice thermal conductivity of nanoscale SiO2 thin films was observed. Additionally, SiO2 thin films with [001] oriented exhibited greater thermal conductivity compared with other crystal orientations which was discussed in terms of phonon density of states (PDOS). Furthermore, the porosity of void defects was introduced to quantify the influence of defects for thermal conductivity. Results exhibited that the thermal conductivity degraded with the increase of porosity. Two thermal conductivity suppression mechanisms, namely, void defects induced material loss interdicting heat conduction and phonon scattering enhanced by the boundary of defects, were proposed. Then, a further simulation was deployed to find that the effect of boundary scattering of defects was dominant in thermal conductivity degradation compared with material loss mechanism. The conclusion suggests that the thermal conductivity could be configured via regulating the distribution of PDOS directly associated with void defects.

  15. Nanodimple Arrays Fabricated on SiO2 Surfaces by Wet Etching through Block Copolymer Thin Films

    NASA Astrophysics Data System (ADS)

    Watanabe, Ryoko; Kamata, Kaori; Iyoda, Tomokazu

    2008-06-01

    Block copolymer thin films are promising nanotemplates because highly ordered periodic structures are spontaneously formed through microphase separation on a deca-nanometer scale and over a large area. An amphiphilic block copolymer, which consists of poly(ethylene oxide) (PEO) and poly(methacrylate) (PMA) with azobenzene mesogens and is denoted by PEOm-b-PMA(Az)n, indicates a strong chemical contrast between the corresponding microdomains, which offer structurally reliable nanotemplates for fabricating nanostructured materials. Thermally annealing a PEOm-b-PMA(Az)n thin film provides hexagonally arranged, perpendicularly oriented PEO cylinders, which perform as ion-conductive nanochannels. In this study, a SiO2 layer on a silicon wafer substrate is etched by NH4F through a PEO114-b-PMA(Az)54 thin film as a nanomask. The SiO2 layer is patterned with a 24-nm-periodic hexagonally arranged nanodimple array. Atomic force microscope (AFM), field emission scanning electron microscope (FESEM), and cross-sectional transmission electron microscope (TEM) observations reveal that the nanodimple array has a 2-nm depth and is spread over the entire SiO2 surface on centimeter scale.

  16. Studies on VO{sub x} thin films deposited over Si{sub 3}N{sub 4} coated Si substrates

    SciTech Connect

    Raj, P. Deepak; Sridharan, M.; Gupta, Sudha

    2015-06-24

    Vanadium oxide (VO{sub x}) thin films were deposited on to the silicon nitride (Si{sub 3}N{sub 4}) coated silicon (Si) substrate using reactive direct current magnetron sputtering at different substrate temperatures (T{sub s}). The deposited films were characterized for their structural, morphological, optical and electrical properties. The average grain size of the deposited films was in the range of 95 to 178 nm and the strain varied from 0.071 to 0.054 %. The optical bandgap values of the films were evaluated using UV-Vis spectroscopy and lies in the range of 2.46 to 3.88 eV. The temperature coefficient of resistance (TCR) for the film deposited at 125 °C was -1.23%/°C with the sheet resistivity of 2.7 Ω.cm.

  17. "Un-annealed and Annealed Pd Ultra-Thin Film on SiC Characterized by Scanning Probe Microscopy and X-ray Photoelectron Spectroscopy"

    NASA Technical Reports Server (NTRS)

    Lu, W. J.; Shi, D. T.; Elshot, K.; Bryant, E.; Lafate, K.; Chen, H.; Burger, A.; Collins, W. E.

    1998-01-01

    Pd/SiC has been used as a hydrogen and a hydrocarbon gas sensor operated at high temperature. UHV (Ultra High Vacuum)-Scanning Tunneling Microscopy (STM), Atomic Force Microscopy (AFM) and X-ray Photoelectron Spectroscopy (XPS) techniques were applied to study the relationship between the morphology and chemical compositions for Pd ultra-thin films on SiC (less than 30 angstroms) at different annealing temperatures. Pd ultra-thin film on 6H-SiC was prepared by the RF sputtering method. The morphology from UHV-STM and AFM shows that the Pd thin film was well deposited on SiC substrate, and the Pd was partially aggregated to round shaped participates at an annealing temperature of 300 C. At 400 C, the amount of surface participates decreases, and some strap shape participates appear. From XPS, Pd2Si was formed on the surface after annealing at 300 C, and all Pd reacted with SiC to form Pd2Si after annealing at 400 C. The intensity of the XPS Pd peak decreases enormously at 400 C. The Pd film diffused into SiC, and the Schottky barrier height has almost no changes. The work shows the Pd sicilides/SiC have the same electronic properties with Pd/SiC, and explains why the Pd/SiC sensor still responds to hydrogen at high operating temperatures.

  18. Angular distribution and recoil effect for 1 MeV Au+ ions through a Si3N4 thin foil

    SciTech Connect

    Jin, Ke; Zhu, Zihua; Manandhar, Sandeep; Liu, Jia; Chen, Chien-Hung; Shutthanandan, Vaithiyalingam; Thevuthasan, Suntharampillai; Weber, William J; Zhang, Yanwen

    2014-01-01

    The Stopping and Range of Ions in Matter (SRIM) code has been widely used to predict nuclear stopping power and angular distribution of ion-solid collisions. However, experimental validation of the predictions is insufficient for slow heavy ions in nonmetallic compounds. In this work, time-of-flight secondary ion mass spectrometry (ToF-SIMS) is applied to determine the angular distribution of 1 MeV Au ions after penetrating a Si3N4 foil with a thickness of ~100 nm. The exiting Au ions are collected by a Si wafer located ~14 mm behind the Si3N4 foil, and the resulting 2-dimensional distribution of Au ions on the Si wafer is measured by ToF-SIMS. The SRIM-predicted angular distribution of Au ions through the Si3N4 thin foil is compared with the measured results, indicating that SRIM slightly overestimates the nuclear stopping power by up to 10%. In addition, thickness reduction of the suspended Si3N4 foils induced by 1 MeV Au ion irradiation is observed with an average loss rate of ~107 atom/ion.

  19. Glancing angle deposition of SiO{sub 2} thin film microstructures: Investigations of optical and morphological properties

    SciTech Connect

    Tokas, R. B. E-mail: tokasstar@gmail.com; Jena, S. E-mail: tokasstar@gmail.com; Sarkar, P. E-mail: tokasstar@gmail.com; Thakur, S. E-mail: tokasstar@gmail.com; Sahoo, N. K. E-mail: tokasstar@gmail.com

    2014-04-24

    In present work, the optical and the morphological properties of micro-structured SiO{sub 2} thin films fabricated by using glancing angle deposition (GLAD) technique has been carried out. The results are compared with the normally deposited SiO{sub 2} films for the gained advantages. The influence of the glancing angle on the refractive index of porous SiO{sub 2} film was investigated by the spectral transmission measurement in 400–950 nm wavelength regimes. The refractive index has been found to be 1.14@532 nm for the porous SiO{sub 2} film deposited at a glancing angle of 85°. The density and surface qualities of these samples were primarily investigated by using grazing angle X-ray reflectivity (GIXR) and atomic force microscope (AFM) measurements. Results indicate a substantial decrease in film density and refractive index and increase in surface roughness and grain size for GLAD SiO{sub 2} compared to normally deposited SiO{sub 2} films.

  20. Thermal annealing and magnetic anisotropy of NiFe thin films on n+-Si for spintronic device applications

    NASA Astrophysics Data System (ADS)

    Lu, Q. H.; Huang, R.; Wang, L. S.; Wu, Z. G.; Li, C.; Luo, Q.; Zuo, S. Y.; Li, J.; Peng, D. L.; Han, G. L.; Yan, P. X.

    2015-11-01

    To ensure that the magnetic metal electrodes can meet the requirements of the spin injection, NiFe films prepared both on HfO2 dielectric layer and n+-Si directly by sputtering deposition, and treated by conventional furnace annealing and/or high vacuum magnetic field annealing were investigated. It was found that thermal annealing at 250 °C improved the crystalline quality and reduced surface roughness of the NiFe films, thus enhancing its saturation magnetization intensity. The 100 nm thick NiFe films had too large coercive force and saturation magnetization intensity in vertical direction to meet the requirements of Hanle curve detection. While, 30 nm thick NiFe films showed paramagnetic hysteresis loops in vertical direction, and the magnetization intensity of the sample after annealing at 250 °C for 30 min was less than 2% to the parallel when the external magnetic field was given between ±10 Oe. This was preferred to Hanle curve detection. The thin HfO2 dielectric layer between metal and Si partially suppressed the diffusion of Ni in NiFe into Si substrate and formation of NiSi, greatly enhancing the saturation magnetization intensity of the Al/NiFe/HfO2/Si sample by thermal annealing. Those results suggest that Al/NiFe/HfO2/Si structure, from the point view of magnetic electrodes, would be suitable for spin injection and detection applications.

  1. Electrical properties and Kerr effect study of evaporated Fe/Si and Fe/glass thin films

    NASA Astrophysics Data System (ADS)

    Ghebouli, B.; Layadi, A.; Guittoum, A.; Kerkache, L.; Benkerri, M.; Klimov, A.; Preobrazhensky, V.; Pernod, P.

    2009-12-01

    Electrical and magnetic properties were studied for evaporated Fe thin films on glass and Si substrates. These properties were investigated by means of the four point probe and the magneto-optical Kerr effect techniques. Rutherford backscattering (RBS) and scanning electron microscopy (SEM) experiments show no interdiffusion at the interface Fe/Si for these samples. The electrical resistivity ρ is found to be larger in Fe/glass than in Fe/Si for the same thickness. Diffusion at the grain boundaries seems to be the dominant factor in the ρ values in this 6 to 110 nm thickness range; the reflection coefficient is smaller in Fe/glass (R ≈ 0.40) than in Fe/Si(100) (R ≈ 0.65). Saturation field and strain values confirm that Fe films have a stress induced magnetic anisotropy. Coercive field HC values range from 2.45 Oe for Fe/Si(100) to 17.65 Oe for Fe/Si(111) for the same Fe thickness (45 nm).

  2. Oxidation of nano-multilayered AlTiSiN thin films between 600 and 1000 degrees C in air.

    PubMed

    Lee, Jae Chun; Kim, Sun Kyu; Nguyen, Thuan Dinh; Lee, Dong Bok

    2011-07-01

    Multilayered AlTiSiN films with a composition of 32.0Al-12.4Ti-4.9Si-50.7N (at.%) were deposited on a steel substrate in a nitrogen atmosphere by cathodic arc plasma deposition. The films consisted of crystalline approximately 8 nm-thick AISiN nanolayers that originated from the Al-Si target and approximately 3 nm-thick TiN nanolayers that originated from the Ti target. Their oxidation characteristics were studied between 600 and 1000 degrees C for up to 20 h in air. They displayed good oxidation resistance due to the formation of a thin, dense Al2O3 surface scale below which an (Al2O3, TiO2, SiO2)-intermixed inner scale existed. They oxidized slower than TiN films because protective Al2O3-rich scales formed on the surface. However, they oxidized faster than CrN films because impure Al2O3 scale formed on the AlTiSiN film. Their oxidation progressed primarily by the outward diffusion of nitrogen and substrate elements, combined with the inward transport of oxygen that gradually reacted with Al, Ti, and Si in the film.

  3. Research on polycrystalline thin-film CuInGaSe{sub 2} solar cells. Annual subcontract report, 3 May 1991--21 May 1993

    SciTech Connect

    Chen, W.S.; Stewart, J.M.; Mickelsen, R.A.; Devaney, W.E.; Stanbery, B.J.

    1993-10-01

    This report describes work to fabricate high-efficiency CdZnS/CuInGaSe{sub 2}, thin-film solar cells and to develop improved transparent conductor window layers such as ZnO. The specific technical milestone for Phase I was to demonstrate an air mass (AM) 1.5 global 13% , 1-cm{sup 2} total-area CuInGaSe{sub 2} (CIGS) thin-film solar cell. For Phase II, the objective was to demonstrate an AM1.5 global 13.5%, 1-cm{sup 2} total-area efficiency. We focused our activities on three areas. First, we modified the CIGS deposition system to double its substrate capacity. Second, we developed new tooling to enable investigation of a modified aqueous CdZnS process in which the goal was to improve the yield of this critical step in the device fabrication process. Third, we upgraded the ZnO sputtering system to improve its reliability and reproducibility. A dual rotatable cathode metallic source was installed, and the sputtering parameters were further optimized to improve ZnO`s properties as a transparent conducting oxide (TCO). Combining the refined CdZnS process with CIGS from the newly fixtured deposition system enable us to fabricate and deliver a ZnO/Cd{sub 0.08}Zn{sub 0.20}S/CuIn{sub 0.74}Ga{sub 0.26}Se{sub 2} cell on alumina with I-V characteristics, as measured by NREL under standard test conditions, of 13.7% efficiency with V{proportional_to} = 0.5458 V, J{sub sc} = 35.48 mA/cm{sup 2}, FF = 0.688, and efficiency = 14.6%.

  4. SiNx Charge Trap Nonvolatile Memory Based on ZnO Thin Film Transistor Prepared by Atomic Layer Deposition

    NASA Astrophysics Data System (ADS)

    Kim, E.; Lee, K.; Kim, D.; Parsons, G. N.; Park, K.

    2011-12-01

    We fabricated a nonvolatile thin film transistor (TFT) memory with SiNx charge traps using a ZnO thin film as an active channel layer. The thin film of ZnO was deposited by using atomic layer deposition process at TALD = 125 °C. The ZnO films were investigated by X-ray diffraction and X-ray photoemission measurements. The electrical measurements of the nonvolatile TFT memory showed a field-effect mobility of 2.95 cm2 V-1 s-1, a threshold voltage of -7.24 V, a subthreshold swing of 1.7 V/dec, and an on/off ratio of 3.4×105. From the C-V measurement, the memory window of 2 V was obtained.

  5. Superconducting Properties and Phase Analysis of Nb-Si Thin Films Produced by Sputtering

    NASA Astrophysics Data System (ADS)

    Ohshima, Shigetoshi; Shiba, Takashi; Kawanobe, Tadashi; Wakiyama, Tokuo

    1986-09-01

    Nb-Si films were deposited on Nb.84Si.16, Ti3Au and W3Re films with an A15 structure by sputtering. The films with double layers were analyzed using Auger electron spectroscopy. Phase analyses of the sputtered Nb-Si films were carried out by X-ray diffraction studies. The A15 Nb.78Si.22 and Nb.75Si.25 films were grown epitaxially on Nb.84Si.16 and W3Re substrate films. The superconducting transition temperatures of these epitaxial films were found to range between 5 and 9 K.

  6. Current transport and electroluminescence mechanisms in thin SiO2 films containing Si nanocluster-sensitized erbium ions

    NASA Astrophysics Data System (ADS)

    Jambois, O.; Berencen, Y.; Hijazi, K.; Wojdak, M.; Kenyon, A. J.; Gourbilleau, F.; Rizk, R.; Garrido, B.

    2009-09-01

    We have studied the current transport and electroluminescence properties of metal oxide semiconductor (MOS) devices in which the oxide layer, which is codoped with silicon nanoclusters and erbium ions, is made by magnetron sputtering. Electrical measurements have allowed us to identify a Poole-Frenkel conduction mechanism. We observe an important contribution of the Si nanoclusters to the conduction in silicon oxide films, and no evidence of Fowler-Nordheim tunneling. The results suggest that the electroluminescence of the erbium ions in these layers is generated by energy transfer from the Si nanoparticles. Finally, we report an electroluminescence power efficiency above 10-3%.

  7. Recrystallization of polycrystalline silicon

    NASA Technical Reports Server (NTRS)

    Lall, C.; Kulkarni, S. B.; Graham, C. D., Jr.; Pope, D. P.

    1981-01-01

    Optical metallography is used to investigate the recrystallization properties of polycrystalline semiconductor-grade silicon. It is found that polycrystalline silicon recrystallizes at 1380 C in relatively short times, provided that the prior deformation is greater than 30%. For a prior deformation of about 40%, the recrystallization process is essentially complete in about 30 minutes. Silicon recrystallizes at a substantially slower rate than metals at equivalent homologous temperatures. The recrystallized grain size is insensitive to the amount of prestrain for strains in the range of 10-50%.

  8. Crystal growth kinetics of ultra-thin ZrO2 film on Si by differential scanning calorimetry

    NASA Astrophysics Data System (ADS)

    Faruque, Sk Abdul Kader Md; Debnath, Debika; Giri, Bimalesh; Chakraborty, Supratic

    2017-02-01

    Crystal growth kinetics of thin ZrO2 film deposited on Si is described in the framework of Johnson, Mehl and Avrami (JMA) equation and Kissinger method. Differential scanning calorimetry is employed here to determine the Avrami exponent and the activation energy of crystalline transition from the amorphous nature of ZrO2/Si. The activation energy is found to be 0.77 ± 0.06 eV, estimated from the slope of Kissinger plot. From the variation of Avrami exponent, it is observed that the crystallization of ZrO2 begins at the ZrO2/Si interface and grows normal to the interface at lower temperature range. The crystallization grows laterally, identified as heterogeneous nucleation at the grain boundary that dominates at higher temperature range indicating an increase in its grain size without increasing the number of grains. Only the growth along the grain boundary occurs during heterogeneous crystallization.

  9. Thermal oxidation of amorphous germanium thin films on SiO2 substrates

    NASA Astrophysics Data System (ADS)

    de los Santos Valladares, L.; Bustamante Dominguez, A.; Ionescu, A.; Brown, A.; Sepe, A.; Steiner, U.; Avalos Quispe, O.; Holmes, S.; Majima, Y.; Langford, R.; Barnes, C. H. W.

    2016-12-01

    In this work we report the thermal oxidation of amorphous germanium (a-Ge) thin films (140 nm thickness) in air. Following fabrication by conventional thermal evaporation on SiO2 substrates, the samples were annealed in air at different temperatures ranging from 300 to 1000 °C. By means of x-ray diffraction, x-ray reflectivity, synchrotron grazing-incidence wide-angle x-ray scattering and cross-sectional transmission electron microscopy analysis it is found that the a-Ge films abruptly crystallize at 475 °C, while simultaneously increasing the thickness of the oxide (GeO2) in a layer by layer fashion. X-ray photoemission spectroscopy reveals that the oxidation state of the Ge atoms in the GeO2 layer is 4+. However, a reaction at the GeO2/Ge interface occurs between 500 and 550 °C reducing the oxide layer to GeO x (x < 2) and containing Ge2+ and Ge+. The thickness of the oxide layer grows with the annealing temperature following an Arrhenius behavior with an activation energy of 0.82 ± 0.09 eV up to 500 °C. Remarkably, we observed simultaneous enhancement of the oxidation and crystallization of the a-Ge in the temperature interval 450 °C-500 °C, in which the oxidation rate reaches a maximum of around 0.8 nm °C-1 at around 500 °C.

  10. Large-area SiC membrane produced by plasma enhanced chemical vapor deposition at relatively high temperature

    SciTech Connect

    Liu, Yu; Xie, Changqing

    2015-09-15

    Advances in the growth of silicon carbide (SiC) thin films with outstanding thermal and mechanical properties have received considerable attention. However, the fabrication of large-area free-standing SiC membrane still remains a challenge. Here, the authors report a plasma enhanced chemical vapor deposition process at a relatively high temperature to improve the free-standing SiC membrane area. A systematic study on the microstructural, mechanical, and optical properties of hydrogenated polycrystalline silicon carbide (poly-SiC{sub x}:H) thin films deposited at 600 °C with different annealing temperatures has been performed. In the as-deposited state, SiC{sub x}:H thin films show a polycrystalline structure. The crystallinity degree can be further improved with the increase of the postdeposition annealing temperature. The resulting process produced free-standing 2-μm-thick SiC membranes up to 70 mm in diameter with root mean square roughness of 3.384 nm and optical transparency of about 70% at 632.8 nm wavelength. The large-area SiC membranes made out of poly-SiC{sub x}:H thin films deposited at a relatively high temperature can be beneficial for a wide variety of applications, such as x-ray diffractive optical elements, optical and mechanical filtering, lithography mask, lightweight space telescopes, etc.

  11. Research on polycrystalline thin-film submodules based on CuInSe{sub 2} materials. Final technical report, 14 December 1995--31 December 1996

    SciTech Connect

    Arya, R; Fogleboch, J; Kessler, J; Russell, L; Skibo, S; Wiedeman, S

    1997-04-01

    This report describes the progress made at Solarex for both device and module efficiencies from the inception of the CIS research program to the present. A rapid improvement in efficiency is apparent, culminating in the fabrication of a 15.5%-efficient device (total area) and a 13%-efficient submodule (aperture area). The device represents the highest efficiency device measured by NREL for any industrial source at that time. The module represented a new world record for any thin-film module at the time of its measurement. The factors leading to these results included improvements in absorber layer quality, transparent contacts, scribing and module formation processes. Other elements critical to the commercialization of CIS-based photovoltaics were also successfully attacked, including reduction of absorber deposition times into the range of 10 to 20 minutes and the successful scale-up of the absorber deposition process to greater than 500 cm{sup 2}. Other requisite processes saw continued development, such as a rapid, low-cost method for transparent window deposition. Subsequent to the demonstration of 13% module efficiency, scribing techniques were further improved that resulted in a reduction in shunt losses and higher module fill factor. This improvement, and the concomitant gain in fill factor, would yield efficiencies approaching 14% on modules having a short-circuit and open-circuit voltage comparable to the record module.

  12. Performance of RF sputtered p-Si/n-ZnO nanoparticle thin film heterojunction diodes in high temperature environment

    NASA Astrophysics Data System (ADS)

    Singh, Satyendra Kumar; Hazra, Purnima

    2017-04-01

    In this article, temperature-dependent current-voltage characteristics of n-ZnO/p-Si nanoparticle thin film heterojunction diode grown by RF sputtering technique are analyzed in the temperature range of 300-433 k to investigate the performance of the device in high temperature environment. The microstructural, morphological, optical and temptrature dependent electrical properties of as-grown nanoparticle thin film were characterized by X-ray diffractometer (XRD), atomic force microscopy (AFM), field emmision scanning electron microscopy (FESEM), energy-dispersive X-ray spectroscopy (EDX), variable angle ellipsometer and semiconductor device analyzer. XRD spectra of as-grown ZnO films are exhibited that highly c-axis oriented ZnO nanostructures are grown on p- Si<100> substrate whereas AFM and FESEM images confirm the homogeneous deposition of ZnO nanoparticles on surface of Si substratewith minimum roughness.The optical propertiesof as-grown ZnO nanoparticles have been measured in the spectral range of 300-800 nm using variable angle ellipsometer.To measure electrical parameters of the device prototype in the temperature range of room temperature (300 K) to 433 K, large area ohmic contacts were fabricated on both side of the ZnO/Si heterostructure. From the current-voltage charcteristics of ZnO/Si heterojunction device, it is observed that the device exhibits rectifing nature at room temperature. However, with increase in temperature, reverse saturation current and barrier height are found to increase, whereas ideality factor is started decreasing. This phenomenon confirms that barrier inhomogeneities are present at the interface of ZnO/Si heterojunction, as a result of lattice constant and thermal coefficient mismatch between Si and ZnO. Therefore, a modified value of Richardson constant [33.06 Acm-2K-2] has been extracted from the temperature-dependent electrical characteristics after assuming the Gaussian distribution of special barrier height inhomogeneities

  13. The Effect of Water on the Growth of Multi-layered Polycrystalline Reaction rims in the System CaO-MgO-SiO2

    NASA Astrophysics Data System (ADS)

    Wohlers, A.; Joachim, B.; Koch-Mueller, M.; Schade, U.

    2012-12-01

    The effect of traces of water is of paramount importance for kinetics in natural rocks. Experimental results show that traces of water released at a reaction front have a major effect on the growth rates and phase sequence of the reaction rim. Experiments on polished synthetic, single crystals of OH-doped periclase (MgO) and wollastonite (dry) (CaSiO3) were reacted in an Internally Heated Pressure device at 0.5 GPa and 1200°C, 21.5hr to 96hr. Water-doped periclase as starting material allows to control the water initiation to the experiments on the ppm level. Homogenous OH distribution of the periclase starting material was analyzed with FTIR spectroscopy. In the absence of an periclase-specific calibration, the quantification of hydrogen concentration expressed as H2O-equivalent was done after [1] and gives 3.5 wt ppm H2O at ambient P/T. Raman spectroscopy, which shows OH-defect related bands at identical wavenumbers yields an H2O equivalent concentration of about 9 wt ppm quantified after [2]. A complex multi-layered rim consisting of the phases forsterite, monticellite, merwinite and akermanite grows between periclase and wollastonite at the P/T conditions mentioned above. Rim thickness of individual rim phases are between 3 to 20 μm. Conventional and synchrotron IR radiation was used at Bessy II (Berlin, Germany) with a spatial resolution down to 5 x 5 μm to analyze how water prevails in the starting material and reaction rims. A series of FTIR spectra were recorded in a line scan over the periclase toward the rim sequence. The periclase spectra show typical absorption bands at 3297 and 3310.5 cm-1 which are interpreted as OH stretching vibrations [3]. In addition an absorption band at 3697 cm-1 is observed, which is associated to Mg(OH)2 precipitate [4], which develops during quenching. In general the initial OH-doped periclase partially dehydrated during the rim growth experiments. We observe a gradient towards the reaction rim: water concentration

  14. Growth and Doping of SiC-Thin Films on Low-Stress, Amorphous Si3N4/Si Substrates for Robust Microelectromechanical Systems Applications

    DTIC Science & Technology

    2002-01-01

    111) peak as a function of 3MS flow rate. Growth temperature: 1200°C, and N2 flow rate: 1 sccm. Fig. 5. Resistivity and sheet resistance of SiC films...at 300 K as a function of growth temperature. Flow rates: 30 sccm 3MS and 1 sccm N2. Fig. 6. Resistivity and sheet resistance of SiC films at 300 K...as a function of 3MS flow rate. Growth temperature: 1200°C, and N2 flow rate: 1 sccm. Fig. 7. Resistivity and sheet resistance of SiC films at 300 K as

  15. Elastic tunneling charge transport mechanisms in silicon quantum dots / Si O 2 thin films and superlattices

    NASA Astrophysics Data System (ADS)

    Illera, S.; Prades, J. D.; Cirera, A.

    2015-05-01

    The role of different charge transport mechanisms in Si / Si O 2 structures has been studied. A theoretical model based on the Transfer Hamiltonian Formalism has been developed to explain experimental current trends in terms of three different elastic tunneling processes: (1) trap assisted tunneling; (2) transport through an intermediate quantum dot; and (3) direct tunneling between leads. In general, at low fields carrier transport is dominated by the quantum dots whereas, for moderate and high fields, transport through deep traps inherent to the SiO2 is the most relevant process. Besides, current trends in Si / Si O 2 superlattice structure have been properly reproduced.

  16. Polycrystalline thin-film cadmium telluride solar cells fabricated by electrodeposition. Annual subcontract report, 20 March 1992--19 March 1993

    SciTech Connect

    Trefny, J.U.; Furtak, T.E.; Wada, N.; Williamson, D.L.; Kim, D.

    1993-08-01

    This report describes progress during the first year of a 3-year program at Colorado School of Mines, based upon earlier studies performed by Ametek Corporation, to develop specific layers of the Ametek n-i-p structure as well as additional studies of several transparent conducting oxides. Thin films of ZnO and ZnO:Al were deposited under various conditions. For the n-layer of the Ametek structure, a dip-coating method was developed for the deposition of CdS films. The authors also present data on the characterization of these films by X-ray diffraction, Raman spectroscopy, scanning tunneling microscopy, small-angle X-ray scattering, and other techniques. They made progress in the electrodeposition of the CdTe i-layer of the Ametek structure. They developed appropriate electrochemical baths and are beginning to understand the role of the many experimental parameters that must be controlled to obtain high-quality films of this material. They explored the possibility of using an electrochemical process for fabricating the ZnTe p-layer. Some preliminary success was achieved, and this step will be pursued in the next phase. Finally, they fabricated a number of ``dot`` solar cells with the structure glass/SnO{sub 2}/CdS/CdTe/Au. Several cells with efficiencies in the range of 5%-6% were obtained, and they are confident, given recent progress, that cells with efficiencies in excess of 10% will be achieved in the near future.

  17. a-SiCxNy:H thin films for applications in solar cells as passivation and antireflective coatings

    NASA Astrophysics Data System (ADS)

    Swatowska, Barbara; Kluska, Stanisława; Lewińska, Gabriela; Golańska, Julia; Stapiński, Tomasz

    2016-12-01

    Amorphous a-SiCxNy:H thin films may be an alternative to a-Si:N:H coatings which are commonly used in silicon solar cells. This material was obtained by PECVD (13.56 MHz) method. The reaction gases used: silane, methane, nitrogen and ammonia. The structure of the layers were investigated by scanning electron microscopy (SEM) and infrared spectroscopy (FTIR). IR absorption spectra of a-SiCxNy:H layers confirmed the presence of various hydrogen bonds - it is important for passivation of Si structural defects. The ellipsometric measurements were implemented to determine the thickness of layers d, refractive index n, extinction coefficient k and energy gap Eg. The values of the energy gap of a-SiCxNy:H layers are in the range from 1.89 to 4.34 eV. The correlation between energy gap of materials and refractive index was found. Generally the introduction of N and/or C into the amorphous silicon network rapidly increases the Eg values.

  18. Impact of reductive N2/H2 plasma on porous low-dielectric constant SiCOH thin films

    NASA Astrophysics Data System (ADS)

    Cui, Hao; Carter, Richard J.; Moore, Darren L.; Peng, Hua-Gen; Gidley, David W.; Burke, Peter A.

    2005-06-01

    Porous low-dielectric constant (low-κ) SiCOH thin films deposited using a plasma-enhanced chemical-vapor deposition have been comprehensively characterized before and after exposure to a reactive-ion-etch-type plasma of N2 and H2 chemistry. The low-κ film studied in this work is a carbon-doped silicon oxide film with a dielectric constant (κ) of 2.5. Studies show that a top dense layer is formed as a result of significant surface film densification after exposure to N2/H2 plasma while the underlying bulk layer remains largely unchanged. The top dense layer is found to seal the porous bulk SiCOH film. SiCOH films experienced significant thickness reduction, κ increase, and leakage current degradation after plasma exposure, accompanied by density increase, pore collapse, carbon depletion, and moisture content increase in the top dense layer. Both film densification and removal processes during N2/H2 plasma treatment were found to play important roles in the thickness reduction and κ increase of this porous low-κ SiCOH film. A model based upon mutually limiting film densification and removal processes is proposed for the continuous thickness reduction during plasma exposure. A combination of surface film densification, thickness ratio increase of top dense layer to bulk layer, and moisture content increase results in the increase in κ value of this SiCOH film.

  19. Thin film poly-Si solar cell with ``STAR structure`` on glass substrate fabricated at low temperature

    SciTech Connect

    Yamamoto, Kenji; Yoshimi, Masashi; Suzuki, Takayuki; Okamoto, Yoshifumi; Tawada, Yuko; Nakajima, Akihiko

    1997-12-31

    The performances of thin film poly-Si solar cells with a thickness of less than 5 {micro}m on a glass substrate have been systematically investigated as a function of thickness. The cell of glass/back reflector/n-i-p poly-Si/ITO is well characterized by the structure of naturally surface texture and enhanced absorption with a back reflector (STAR), where the active i-layer was fabricated by plasma chemical vapor deposition (CVD) at low temperature. The cell with a thickness of 3.5 {micro}M and 2.5 {micro}m demonstrated an intrinsic efficiency of 9.8%, as independently confirmed by Japan Quality Assurance. The optical confinement effect explains the excellent spectral response at long wavelength for the cells through the PC1D analysis. The higher sensitivity at long-wavelength of the cell appeared in quantum efficiency curves is well correlated to the result of reflectance measurement. The open circuit voltage of 0.526 mV and the efficiency of 9.3% has been achieved for the cell with a thickness of 1.5 {micro}m, which was proved to be entirely stable with respect to the light-soaking. The stabilized efficiency of the developed a-Si:H/poly-Si/poly-Si stacked solar cell exhibits the efficiency of 11.5%.

  20. High-Q AlN/SiO2 symmetric composite thin film bulk acoustic wave resonators.

    PubMed

    Artieda, Alvaro; Muralt, Paul

    2008-11-01

    High-Q, bulk acoustic wave composite resonators based on a symmetric layer sequence of SiO(2)-AlN-SiO(2) sandwiched between electrodes have been developed. Acoustic isolation was achieved by means of deep silicon etching to obtain membrane type thin film bulk acoustic wave resonators (TFBARs). Three different device versions were investigated. The SiO(2) film thicknesses were varied (0 nm, 70 nm, 310 nm, and 770 nm) while the piezoelectric AlN film had a constant thickness of 1.2 microm. The sputter-deposited AlN film grown on the amorphous, sputter-deposited SiO(2) layer exhibited a d(33,f) of 4.0 pm/V. Experimental results of quality factors (Q) and coupling coefficients (k(t)(2)) are in agreement with finite element calculations. A Q of 2000 is observed for the first harmonic of the 310 nm oxide devices. The most intense resonance of the 770 nm oxide device is the third harmonic reaching Q factors of 1450. The temperature drift reveals the impact of the SiO(2) layers, which is more pronounced on the first harmonic, reducing the TCF to 4 ppm/K for the 3rd harmonic of the 310 nm oxide devices.

  1. Synthesis of Si-NWs by PECVD using Sn as catalyst on TCO thin film for optoelectronic devicies

    NASA Astrophysics Data System (ADS)

    Pham, Thanh Tuan; Le, Vu Tuan Hung; Cu, Son T.; Stuchlik, J.

    2014-12-01

    In this paper we focus on silicon nanowires (Si-NWs) which were fabricated on transparent conductive substrates by plasma-enhanced chemical vapor deposition (PECVD) method using Sn as stimulated catalyst metal. Transparent conductive substrates which we used are ZnO fabricated by direct current (dc) sputtering. Property of ZnO thin film was investigated by x-ray diffraction (XRD), volt-ohm-miliampere (VOM) meter, and Stylus method. In order to grow Si-NWs using PECVD we need to use metal as catalyst. We used Sn as catalyst to synthesize Si-NWs. Sn catalyst nanoparticles were fabricated by high vacuum evaporation system (SenVact). Size and density of Sn catalyst nanoparticles were investigated by scanning electron microscope (SEM). The influence of the thickness of metal layers on forming Sn catalyst nanoparticles was studied. In particular, the factors affecting the formation of Si-NWs such as temperature and rate of gas were examined. Si-NWs’ properties were investigated by SEM, Raman spectroscopy and energy dispersive x-ray (EDX) spectrocopy.

  2. Comparison of effective transverse piezoelectric coefficients e31,f of Pb(Zr,Ti)O3 thin films between direct and converse piezoelectric effects

    NASA Astrophysics Data System (ADS)

    Tsujiura, Yuichi; Kawabe, Saneyuki; Kurokawa, Fumiya; Hida, Hirotaka; Kanno, Isaku

    2015-10-01

    We evaluated the effective transverse piezoelectric coefficients (e31,f) of Pb(Zr,Ti)O3 (PZT) thin films from both the direct and converse piezoelectric effects of unimorph cantilevers. (001) preferentially oriented polycrystalline PZT thin films and (001)/(100) epitaxial PZT thin films were deposited on (111)Pt/Ti/Si and (001)Pt/MgO substrates, respectively, by rf-magnetron sputtering, and their piezoelectric responses owing to intrinsic and extrinsic effects were examined. The direct and converse |e31,f| values of the polycrystalline PZT thin films were calculated as 6.4 and 11.5-15.0 C/m2, respectively, whereas those of the epitaxial PZT thin films were calculated as 3.4 and 4.6-4.8 C/m2, respectively. The large |e31,f| of the converse piezoelectric property of the polycrystalline PZT thin films is attributed to extrinsic piezoelectric effects. Furthermore, the polycrystalline PZT thin films show a clear nonlinear piezoelectric contribution, which is the same as the Rayleigh-like behavior reported in bulk PZT. In contrast, the epitaxial PZT thin films on the MgO substrate show a piezoelectric response owing to the intrinsic and linear extrinsic effects, and no nonlinear contribution was observed.

  3. Interfacial reactions of ultrahigh-vacuum-deposited Cu thin films on atomically cleaned (111)Si. I. Phase formation and interface structure

    NASA Astrophysics Data System (ADS)

    Liu, C. S.; Chen, L. J.

    1993-11-01

    Interfacial reactions of ultrahigh-vacuum-deposited Cu thin films on atomically cleaned (111)Si have been studied by transmission electron microscopy, x-ray diffractometry, and Auger electron spectroscopy. An interface compound, CuSix with x=11.2-14 at. %, was observed to be present at the Cu/Si interface. η`-Cu3Si was found to form in samples annealed at 200 °C for 1 h. Solid-phase-epitaxial growth of silicon on (111)Si through a transport media (Cu or Cu3Si) was observed to occur at a temperature as low as 200 °C. Preferentially oriented η`-Cu3Si is the only phase present in samples annealed at 200-800 °C. In samples annealed at or higher than 850 °C, a mixture of η'-Cu3Si and η`-Cu3Si was found to be present.

  4. Fabrication of Source/Drain Electrodes for a-Si:H Thin-Film Transistors Using a Single Cu Alloy Target

    NASA Astrophysics Data System (ADS)

    Lee, J. H.; Lee, C. Y.; Nam, H. S.; Lee, J. G.; Yang, H. J.; Ho, W. J.; Jeong, J. Y.; Koo, D. H.

    2011-11-01

    A Cu alloy/Cu alloy oxide bilayer structure was formed on an n +-a-Si:H substrate using a single Cu alloy target. It was employed for the source/drain electrodes in the fabrication of a-Si:H thin-film transistors with good electrical performance, high thermal stability, and good adhesion. Transmission electron microscopy and electron energy-loss spectroscopy analyses revealed that the initial sputtering of the Cu alloy in O2/Ar allowed for preferential oxidation of Si and the formation of a SiO x /Cu-supersaturated a-Si:H bilayer at the copper oxide-a-Si:H interface. This bilayer turned into an SiO x /Cu3Si bilayer after annealing at 300°C. It provided a stable contact structure with low contact resistance.

  5. A Semitransparent and Flexible Single Crystal Si Thin Film: Silicon on Nothing (SON) Revisited.

    PubMed

    Park, Sanghyun; Lee, Yong Hwan; Wi, Jung-Sub; Oh, Jihun

    2016-07-27

    Ultrathin single crystal Si films offer a versatile vehicle for high performance flexible and semitransparent electric devices due to their outstanding optoelectric and mechanical properties. Here, we demonstrate the formation of an ultrathin (100) single crystal Si film based on morphological evolution of nanoporous Si during high temperature annealing. Square arrays of cylindrical Si pores are formed by nanoimprint lithography and deep reactive etching and then subjected to annealing in hydrogen ambient. By controlling the aspect ratio of nanoporous Si, defect-free single crystal Si membranes with controlled thicknesses from 330 to 470 nm are formed on a platelike void after the annealing. In addition, we investigate the role of oxygen impurities in a hydrogen atmosphere on defect formation on a Si surface and eliminate the oxygen-related defects on Si by controlling gas phase diffusion of oxygen impurities during annealing in a conventional tube furnace. Finally, we demonstrate the transfer of a defect-free, flexible, and wafer scale Si membrane with thickness of 470 nm onto a PDMS substrate, utilizing the platelike void under the membrane as a releaser. The ultrathin flexible Si film on PDMS shows optical transmittance of about 30-70% in visible and near-infrared light.

  6. Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition

    NASA Astrophysics Data System (ADS)

    Hadimani, Ravi L.; Silva, Joao H. B.; Pereira, Andre M.; Schlagel, Devo L.; Lograsso, Thomas A.; Ren, Yang; Zhang, Xiaoyi; Jiles, David C.; Araújo, Joao P.

    2015-01-01

    Magnetic refrigeration based on the magnetocaloric effect is one of the best alternatives to compete with vapor-compression technology. Despite being already in its technology transfer stage, there is still room for optimization, namely, on the magnetic responses of the magnetocaloric material. In parallel, the demand for different magnetostrictive materials has been greatly enhanced due to the wide and innovative range of technologies that emerged in the last years (from structural evaluation to straintronics fields). In particular, the Gd5(SixGe1-x)4 compounds are a family of well-known alloys that present both giant magnetocaloric and colossal magnetostriction effects. Despite their remarkable properties, very few reports have been dedicated to the nanostructuring of these materials: here, we report a ˜800 nm Gd5Si2.7Ge1.3 thin film. The magnetic and structural investigation revealed that the film undergoes a first order magnetostructural transition and as a consequence exhibits large magnetocaloric effect (-ΔSmMAX ˜ 8.83 J kg-1 K-1, ΔH = 5T) and giant thermal expansion (12000 p.p.m). The thin film presents a broader magnetic response in comparison with the bulk compound, which results in a beneficial magnetic hysteresis reduction. The ΔSmMAX exhibited by the Gd5(Si,Ge)4 thin film makes it a promising candidate for micro/nano magnetic refrigeration area.

  7. X-ray diffraction direct-methods analysis of surfactant-aided Ge/Si(001) thin films

    NASA Astrophysics Data System (ADS)

    Walko, D. A.; Tinkham, B. P.; Bedzyk, M. J.; Yacoby, Y.

    2004-03-01

    We have used surfactant-mediated epitaxy to grow thin films of Ge on Si(001), analyzing the structure and quality of the films with specular x-ray diffraction near the Si(004) Bragg peak. Samples were prepared with Ge film thicknesses of 1 to 10 Åwith ˜100 Å Si caps. We compare samples grown with Te or Bi as surfactant as well as samples grown without any surfactant. We find that simple models do not have enough parameters to adequatley fit the diffraction data, even in this apparently straightforward system. Therefore, we have used the direct-methods technique of Coherent Bragg-Rod Analysis (COBRA) to study these thin films. COBRA determines the complex structure factors along the bulk-defined rod of scattering, which can be Fourier-transformed to recover the vertical profile of a sample's electron density without relying upon a highly detailed model. Since data from only the specular rod is used, this application of the COBRA method is valid for Ge films which are relaxed as well as coherently strained to the substrate.

  8. Characterization of ion-assisted induced absorption in A-Si thin-films used for multivariate optical computing

    NASA Astrophysics Data System (ADS)

    Nayak, Aditya B.; Price, James M.; Dai, Bin; Perkins, David; Chen, Ding Ding; Jones, Christopher M.

    2015-06-01

    Multivariate optical computing (MOC), an optical sensing technique for analog calculation, allows direct and robust measurement of chemical and physical properties of complex fluid samples in high-pressure/high-temperature (HP/HT) downhole environments. The core of this MOC technology is the integrated computational element (ICE), an optical element with a wavelength-dependent transmission spectrum designed to allow the detector to respond sensitively and specifically to the analytes of interest. A key differentiator of this technology is it uses all of the information present in the broadband optical spectrum to determine the proportion of the analyte present in a complex fluid mixture. The detection methodology is photometric in nature; therefore, this technology does not require a spectrometer to measure and record a spectrum or a computer to perform calculations on the recorded optical spectrum. The integrated computational element is a thin-film optical element with a specific optical response function designed for each analyte. The optical response function is achieved by fabricating alternating layers of high-index (a-Si) and low-index (SiO2) thin films onto a transparent substrate (BK7 glass) using traditional thin-film manufacturing processes (e.g., ion-assisted e-beam vacuum deposition). A proprietary software and process are used to control the thickness and material properties, including the optical constants of the materials during deposition to achieve the desired optical response function. The ion-assisted deposition is useful for controlling the densification of the film, stoichiometry, and material optical constants as well as to achieve high deposition growth rates and moisture-stable films. However, the ion-source can induce undesirable absorption in the film; and subsequently, modify the optical constants of the material during the ramp-up and stabilization period of the e-gun and ion-source, respectively. This paper characterizes the unwanted

  9. Influence of CuxS back contact on CdTe thin film solar cells

    NASA Astrophysics Data System (ADS)

    Zhi, Lei; Lianghuan, Feng; Guanggen, Zeng; Wei, Li; Jingquan, Zhang; Lili, Wu; Wenwu, Wang

    2013-01-01

    We present a detailed study on CuxS polycrystalline thin films prepared by chemical bath method and utilized as back contact material for CdTe solar cells. The characteristics of the films deposited on Si-substrate are studied by XRD. The results show that as-deposited CuxS thin film is in an amorphous phase while after annealing, samples are in polycrystalline phases with increasing temperature. The thickness of CuxS thin films has great impact on the performance of CdS/CdTe solar cells. When the thickness of the film is about 75 nm the performance of CdS/CdTe thin film solar cells is found to be the best. The energy conversion efficiency can be higher than 12.19%, the filling factor is higher than 68.82% and the open-circuit voltage is more than 820 mV.

  10. Tungsten-rhenium thin film thermocouples for SiC-based ceramic matrix composites.

    PubMed

    Tian, Bian; Zhang, Zhongkai; Shi, Peng; Zheng, Chen; Yu, Qiuyue; Jing, Weixuan; Jiang, Zhuangde

    2017-01-01

    A tungsten-rhenium thin film thermocouple is designed and fabricated, depending on the principle of thermal-electric effect caused by the high temperature. The characteristics of thin film thermocouples in different temperatures are investigated via numerical analysis and analog simulation. The working mechanism and thermo-electric features of the thermocouples are analyzed depending on the simulation results. Then the thin film thermocouples are fabricated and calibrated. The calibration results show that the thin film thermocouples based on the tungsten-rhenium material achieve ideal static characteristics and work well in the practical applications.

  11. Tungsten-rhenium thin film thermocouples for SiC-based ceramic matrix composites

    NASA Astrophysics Data System (ADS)

    Tian, Bian; Zhang, Zhongkai; Shi, Peng; Zheng, Chen; Yu, Qiuyue; Jing, Weixuan; Jiang, Zhuangde

    2017-01-01

    A tungsten-rhenium thin film thermocouple is designed and fabricated, depending on the principle of thermal-electric effect caused by the high temperature. The characteristics of thin film thermocouples in different temperatures are investigated via numerical analysis and analog simulation. The working mechanism and thermo-electric features of the thermocouples are analyzed depending on the simulation results. Then the thin film thermocouples are fabricated and calibrated. The calibration results show that the thin film thermocouples based on the tungsten-rhenium material achieve ideal static characteristics and work well in the practical applications.

  12. CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES: Tunable Anisotropic Absorption of Ag-Embedded SiO2 Thin Films by Oblique Angle Deposition

    NASA Astrophysics Data System (ADS)

    Xiao, Xiu-Di; Dong, Guo-Ping; Shao, Jian-Da; Fan, Zheng-Xiu; He, Hong-Bo; Qi, Hong-Ji

    2009-08-01

    Ag-embedded SiO2 thin films are prepared by oblique angle deposition. Through field emission scanning electron microscopy (SEM), an orientated slanted columnar structure is observed. Energy-dispersive x-ray (EDX) analysis shows the Ag concentration is about 3% in the anisotropic SiO2 matrix. Anisotropic surface plasma resonance (SPR) absorption is observed in the Ag-embedded SiO2 thin films, which is dependent on polarization state and incidence angle of two orthogonal polarized lights and the deposition angle. This means that optical properties and anisotropic SPR absorption can be tunable in Ag-embedded SiO2 thin films. Broadband polarization splitting is also observed and the transmission ratio Tp/Ts between p- and s-polarized lights is up to 2.7 for thin films deposited at α = 70°, which means that Ag-embedded SiO2 thin films are a promising candidate for thin film polarizers.

  13. Fabrication of Cu2Zn(Sn,Si)S4 thin films using a two-step method for solar cell applications

    NASA Astrophysics Data System (ADS)

    Xu, Jiaxiong; Liu, Yaqun; Yang, Yuanzheng

    2016-09-01

    To explore Cu2ZnSnS4-based materials for solar cell applications, for the first time, Cu2Zn(Sn,Si)S4 thin films were fabricated using a two-step method that consists of sputtering and post-sulfurization. The films were characterized and then incorporated into solar cells. X-ray diffraction and Raman spectroscopy revealed the formation of Cu2Zn(Sn,Si)S4 structure with traces of a secondary phase after sulfurization treatments. The degree of sulfurization was enhanced as the temperature was increased. In addition, these techniques revealed that there was no silicon or silicide phase present. The Si/Sn atomic ratio was 0.04-0.10. The thin films exhibited Cu-poor and Zn-rich characteristics and high absorption coefficients. The direct optical band gap of the thin films ranged between 1.42 and 1.52 eV. Heterojunction solar cells (glass/Mo/Cu2Zn(Sn,Si)S4/CdS/i-ZnO/ZnO:Al/Al) were fabricated and exhibited the highest conversion efficiency of 0.427%. This study showed the feasibilities of fabricating Cu2Zn(Sn,Si)S4 thin films by a two-step method and using Cu2Zn(Sn,Si)S4 thin films as an absorber layer within a solar cell.

  14. Semiconducting ZnSnN2 thin films for Si/ZnSnN2 p-n junctions

    NASA Astrophysics Data System (ADS)

    Qin, Ruifeng; Cao, Hongtao; Liang, Lingyan; Xie, Yufang; Zhuge, Fei; Zhang, Hongliang; Gao, Junhua; Javaid, Kashif; Liu, Caichi; Sun, Weizhong

    2016-04-01

    ZnSnN2 is regarded as a promising photovoltaic absorber candidate due to earth-abundance, non-toxicity, and high absorption coefficient. However, it is still a great challenge to synthesize ZnSnN2 films with a low electron concentration, in order to promote the applications of ZnSnN2 as the core active layer in optoelectronic devices. In this work, polycrystalline and high resistance ZnSnN2 films were fabricated by magnetron sputtering technique, then semiconducting films were achieved after post-annealing, and finally Si/ZnSnN2 p-n junctions were constructed. The electron concentration and Hall mobility were enhanced from 2.77 × 1017 to 6.78 × 1017 cm-3 and from 0.37 to 2.07 cm2 V-1 s-1, corresponding to the annealing temperature from 200 to 350 °C. After annealing at 300 °C, the p-n junction exhibited the optimum rectifying characteristics, with a forward-to-reverse ratio over 103. The achievement of this ZnSnN2-based p-n junction makes an opening step forward to realize the practical application of the ZnSnN2 material. In addition, the nonideal behaviors of the p-n junctions under both positive and negative voltages are discussed, in hope of suggesting some ideas to further improve the rectifying characteristics.

  15. X-ray absorption spectroscopic studies of sputter-deposited LaNiO3 thin films on Si substrate

    NASA Astrophysics Data System (ADS)

    Lee, Hsin-Yi; Wu, Tai-Bor; Lee, Jyh-Fu

    1996-08-01

    X-ray absorption spectroscopy (XAS) was applied to investigate the growth behavior of LaNiO3 thin films on Si substrate deposited via radio frequency magnetron sputtering at high temperature. The thickness of deposited film was always proportional to the sputtering time. However, the Ni-to-La ratio in the film was found to decrease with increasing substrate temperature. It is due to a loss of Ni on high-temperature deposition which lowers the film growth rate and leads to a gradual structural change. Nevertheless, the oxidation states of both Ni atom and La atom in the thin films were not influenced by the substrate temperature or sputtering time. All the XAS evidence was consistent with the results from x-ray reflectivity, x-ray diffraction, and chemical analysis.

  16. Diode-like behavior of I-V curves of CoFe-(Al-O)/Si(100) granular thin films

    NASA Astrophysics Data System (ADS)

    Tuan Anh, Nguyen; Van Cuong, Giap; Anh Tuan, Nguyen

    2015-01-01

    In this study, the electrical performance of (Co70Fe30)x(Al-O)1-x (where x=0.1 and 0.3) granular thin films sputtered on Si(1 0 0) substrates, which were subsequently annealing at 350 °C for 1 h in vacuum, was investigated. The millimeter-sized samples were installed in an in-plane lateral Ag electrode configuration on the surface. The current-voltage (I-V) characteristics were measured in bias voltages of approximately ±7 V. The I-V curves demonstrated the so-called large Coulomb gaps and diode-like asymmetric behavior similar to a Zener diode-type rectification. This remarkable behavior was evaluated using the most suitable transport models. Results suggest that an effective magnetic diode could be fabricated from millimeter-sized magnetic granular thin films.

  17. Enhanced photovoltaic performances of graphene/Si solar cells by insertion of a MoS₂ thin film.

    PubMed

    Tsuboi, Yuka; Wang, Feijiu; Kozawa, Daichi; Funahashi, Kazuma; Mouri, Shinichiro; Miyauchi, Yuhei; Takenobu, Taishi; Matsuda, Kazunari

    2015-09-14

    Transition-metal dichalcogenides exhibit great potential as active materials in optoelectronic devices because of their characteristic band structure. Here, we demonstrated that the photovoltaic performances of graphene/Si Schottky junction solar cells were significantly improved by inserting a chemical vapor deposition (CVD)-grown, large MoS2 thin-film layer. This layer functions as an effective electron-blocking/hole-transporting layer. We also demonstrated that the photovoltaic properties are enhanced with the increasing number of graphene layers and the decreasing thickness of the MoS2 layer. A high photovoltaic conversion efficiency of 11.1% was achieved with the optimized trilayer-graphene/MoS2/n-Si solar cell.

  18. Reaction of Ta thin film with single crystalline (001) beta-SiC

    NASA Technical Reports Server (NTRS)

    Chen, J. S.; Kolawa, E.; Nicolet, M.-A.; Ruiz, R. P.; Baud, L.; Jaussaud, C.; Madar, R.

    1994-01-01

    The reaction between a sputtered-deposited Ta film (320 nm thick) and a single crystalline (001) beta-SiC substrate induced by vacuum annealing at temperatures of 600-1200 C for 1 h (30 min at 1100 C) is investigated by 3 MeV He(+2) backscattering spectrometry, x-ray diffraction, secondary ion mass spectrometry, and transmission and scanning electron microscopies. No significant reaction is observed at 800 C or at lower tempertures. At 900 C, the main product phases are Ta2C and carbon-stabilized Ta5Si3. A minor amount of unreacted Ta is also present. After annealing at 1000 C, all the tantalum has reacted; the reaction zone possesses a multilayered structure of beta-SiC/TaC/carbon-stabilized Ta5Si3/alpha-Ta5Si3/Ta2C. The diffusion path at 1000 C is plotted on the isothermal section of the Ta-Si-C phase diagram. At 1100 C, the reacted layer has an interface with the SiC substrate that is still quite flat but has a rough surface due to the formation of macroscopic voids within the reacted layer. The equilibrium products predicted by the phase diagram are TaC and TaSi2. This final state is reached by annealing at 1200 C for 1 h. At that point, the reacted layer has a latterally very uneven structure and morphology.

  19. A device model for thin silicon-on-insulator SiGe heterojunction bipolar transistors with saturation effects

    NASA Astrophysics Data System (ADS)

    Xu, Xiao-Bo; Xu, Kai-Xuan; Zhang, He-Ming; Qin, Shan-Shan

    2011-09-01

    In this paper, we describe the saturation effect of a silicon germanium (SiGe) heterojunction bipolar transistor (HBT) fabricated on a thin silicon-on-insulator (SOI) with a step-by-step derivation of the model formulation. The collector injection width, the internal base—collector bias, and the hole density at the base—collector junction interface are analysed by considering the unique features of the internal and the external parts of the collector, as they are different from those of a bulk counterpart.

  20. Optical Gratings Coated with Thin Si3N4 Layer for Efficient Immunosensing by Optical Waveguide Lightmode Spectroscopy.

    PubMed

    Diéguez, Lorena; Caballero, David; Calderer, Josep; Moreno, Mauricio; Martínez, Elena; Samitier, Josep

    2012-04-10

    New silicon nitride coated optical gratings were tested by means of Optical Waveguide Lightmode Spectroscopy (OWLS). A thin layer of 10 nm of transparent silicon nitride was deposited on commercial optical gratings by means of sputtering. The quality of the layer was tested by x-ray photoelectron spectroscopy and atomic force microscopy. As a proof of concept, the sensors were successfully tested with OWLS by monitoring the concentration dependence on the detection of an antibody-protein pair. The potential of the Si3N4 as functional layer in a real-time biosensor opens new ways for the integration of optical waveguides with microelectronics.