Radioactive waste management: review on clearance levels and acceptance criteria legislation, requirements and standards.

PubMed

Maringer, F J; Suráň, J; Kovář, P; Chauvenet, B; Peyres, V; García-Toraño, E; Cozzella, M L; De Felice, P; Vodenik, B; Hult, M; Rosengård, U; Merimaa, M; Szücs, L; Jeffery, C; Dean, J C J; Tymiński, Z; Arnold, D; Hinca, R; Mirescu, G

2013-11-01

In 2011 the joint research project Metrology for Radioactive Waste Management (MetroRWM)(1) of the European Metrology Research Programme (EMRP) started with a total duration of three years. Within this project, new metrological resources for the assessment of radioactive waste, including their calibration with new reference materials traceable to national standards will be developed. This paper gives a review on national, European and international strategies as basis for science-based metrological requirements in clearance and acceptance of radioactive waste. © 2013 Elsevier Ltd. All rights reserved.

Gaps analysis for CD metrology beyond the 22nm node

NASA Astrophysics Data System (ADS)

Bunday, Benjamin; Germer, Thomas A.; Vartanian, Victor; Cordes, Aaron; Cepler, Aron; Settens, Charles

2013-04-01

This paper will examine the future for critical dimension (CD) metrology. First, we will present the extensive list of applications for which CD metrology solutions are needed, showing commonalities and differences among the various applications. We will then report on the expected technical limits of the metrology solutions currently being investigated by SEMATECH and others in the industry to address the metrology challenges of future nodes, including conventional CD scanning electron microscopy (CD-SEM) and optical critical dimension (OCD) metrology and new potential solutions such as He-ion microscopy (HeIM, sometimes elsewhere referred to as HIM), CD atomic force microscopy (CD-AFM), CD small-angle x-ray scattering (CD-SAXS), high-voltage scanning electron microscopy (HV-SEM), and other types. A technical gap analysis matrix will then be demonstrated, showing the current state of understanding of the future of the CD metrology space.

Neural network approximation of nonlinearity in laser nano-metrology system based on TLMI

NASA Astrophysics Data System (ADS)

Olyaee, Saeed; Hamedi, Samaneh

2011-02-01

In this paper, an approach based on neural network (NN) for nonlinearity modeling in a nano-metrology system using three-longitudinal-mode laser heterodyne interferometer (TLMI) for length and displacement measurements is presented. We model nonlinearity errors that arise from elliptically and non-orthogonally polarized laser beams, rotational error in the alignment of laser head with respect to the polarizing beam splitter, rotational error in the alignment of the mixing polarizer, and unequal transmission coefficients in the polarizing beam splitter. Here we use a neural network algorithm based on the multi-layer perceptron (MLP) network. The simulation results show that multi-layer feed forward perceptron network is successfully applicable to real noisy interferometer signals.

Accelerator science and technology in Europe: EuCARD 2012

NASA Astrophysics Data System (ADS)

Romaniuk, Ryszard S.

2012-05-01

Accelerator science and technology is one of a key enablers of the developments in the particle physic, photon physics and also applications in medicine and industry. The paper presents a digest of the research results in the domain of accelerator science and technology in Europe, shown during the third annual meeting of the EuCARD - European Coordination of Accelerator Research and Development. The conference concerns building of the research infrastructure, including in this advanced photonic and electronic systems for servicing large high energy physics experiments. There are debated a few basic groups of such systems like: measurement - control networks of large geometrical extent, multichannel systems for large amounts of metrological data acquisition, precision photonic networks of reference time, frequency and phase distribution.

Entanglement-enhanced quantum metrology in a noisy environment

NASA Astrophysics Data System (ADS)

Wang, Kunkun; Wang, Xiaoping; Zhan, Xiang; Bian, Zhihao; Li, Jian; Sanders, Barry C.; Xue, Peng

2018-04-01

Quantum metrology overcomes standard precision limits and plays a central role in science and technology. Practically, it is vulnerable to imperfections such as decoherence. Here we demonstrate quantum metrology for noisy channels such that entanglement with ancillary qubits enhances the quantum Fisher information for phase estimation but not otherwise. Our photonic experiment covers a range of noise for various types of channels, including for two randomly alternating channels such that assisted entanglement fails for each noisy channel individually. We simulate noisy channels by implementing space-multiplexed dual interferometers with quantum photonic inputs. We demonstrate the advantage of entanglement-assisted protocols in a phase estimation experiment run with either a single-probe or multiprobe approach. These results establish that entanglement with ancillae is a valuable approach for delivering quantum-enhanced metrology. Our approach to entanglement-assisted quantum metrology via a simple linear-optical interferometric network with easy-to-prepare photonic inputs provides a path towards practical quantum metrology.

Ambient Optomechanical Alignment and Pupil Metrology for the Flight Instruments Aboard the James Webb Space Telescope

NASA Technical Reports Server (NTRS)

Coulter, Phillip; Beaton, Alexander; Gum, Jeffrey S.; Hadjimichael, Theodore J.; Hayden, Joseph E.; Hummel, Susann; Hylan, Jason E.; Lee, David; Madison, Timothy J.; Maszkiewicz, Michael;

MetroFission: New high-temperature references and sensors for the nuclear industry

NASA Astrophysics Data System (ADS)

Sadli, M.; del Campo, D.; de Podesta, M.; Deuzé, T.; Failleau, G.; Elliott, C. J.; Fourrez, S.; García, C.; Pearce, J. V.

2013-09-01

The European metrology research programme (EMRP) allows funding for metrology-oriented projects in the frame of targeted calls aimed at improving metrology for important contemporary and future needs in different fields such as energy, environment and industry. A joint research project (JRP), called "MetroFission", was selected for funding in the "Energy" call of 2010. This JRP, led by NPL (UK), aims to anticipate and to start addressing the metrological needs of the next generation of nuclear power plants. The need for improving the accuracy and reliability of temperature measurements at temperatures higher than those currently measured in nuclear power plants is dealt with in the first workpackage of the project. This project started in September 2010 and will last for three years. This paper summarizes the activities of the first half of the project and the expected final achievements, which will be essentially oriented towards new temperature references and new devices, adapted to the high temperature range as well as the particularly harsh working conditions.

Absolute metrology for space interferometers

NASA Astrophysics Data System (ADS)

Salvadé, Yves; Courteville, Alain; Dändliker, René

2017-11-01

The crucial issue of space-based interferometers is the laser interferometric metrology systems to monitor with very high accuracy optical path differences. Although classical high-resolution laser interferometers using a single wavelength are well developed, this type of incremental interferometer has a severe drawback: any interruption of the interferometer signal results in the loss of the zero reference, which requires a new calibration, starting at zero optical path difference. We propose in this paper an absolute metrology system based on multiplewavelength interferometry.

Using Vision Metrology System for Quality Control in Automotive Industries

NASA Astrophysics Data System (ADS)

Mostofi, N.; Samadzadegan, F.; Roohy, Sh.; Nozari, M.

2012-07-01

The need of more accurate measurements in different stages of industrial applications, such as designing, producing, installation, and etc., is the main reason of encouraging the industry deputy in using of industrial Photogrammetry (Vision Metrology System). With respect to the main advantages of Photogrammetric methods, such as greater economy, high level of automation, capability of noncontact measurement, more flexibility and high accuracy, a good competition occurred between this method and other industrial traditional methods. With respect to the industries that make objects using a main reference model without having any mathematical model of it, main problem of producers is the evaluation of the production line. This problem will be so complicated when both reference and product object just as a physical object is available and comparison of them will be possible with direct measurement. In such case, producers make fixtures fitting reference with limited accuracy. In practical reports sometimes available precision is not better than millimetres. We used a non-metric high resolution digital camera for this investigation and the case study that studied in this paper is a chassis of automobile. In this research, a stable photogrammetric network designed for measuring the industrial object (Both Reference and Product) and then by using the Bundle Adjustment and Self-Calibration methods, differences between the Reference and Product object achieved. These differences will be useful for the producer to improve the production work flow and bringing more accurate products. Results of this research, demonstrate the high potential of proposed method in industrial fields. Presented results prove high efficiency and reliability of this method using RMSE criteria. Achieved RMSE for this case study is smaller than 200 microns that shows the fact of high capability of implemented approach.

Metrological traceability of holmium oxide solution

NASA Astrophysics Data System (ADS)

Gonçalves, D. E. F.; Gomes, J. F. S.; Alvarenga, A. P. D.; Borges, P. P.; Araujo, T. O.

2018-03-01

Holmium oxide solution was prepared as a candidate of certified reference material for spectrophotometer wavelength scale calibration. Here is presented the necessary steps for evaluation of the uncertainty and the establishment of metrological traceability for the production of this material. Preliminary results from the first produced batch are shown.

High-accuracy local positioning network for the alignment of the Mu2e experiment.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hejdukova, Jana B.

This Diploma thesis describes the establishment of a high-precision local positioning network and accelerator alignment for the Mu2e physics experiment. The process of establishing new network consists of few steps: design of the network, pre-analysis, installation works, measurements of the network and making adjustments. Adjustments were performed using two approaches. First is a geodetic approach of taking into account the Earth’s curvature and the metrological approach of a pure 3D Cartesian system on the other side. The comparison of those two approaches is performed and evaluated in the results and compared with expected differences. The effect of the Earth’s curvaturemore » was found to be significant for this kind of network and should not be neglected. The measurements were obtained with Absolute Tracker AT401, leveling instrument Leica DNA03 and gyrotheodolite DMT Gyromat 2000. The coordinates of the points of the reference network were determined by the Least Square Meth od and the overall view is attached as Annexes.« less

Advanced Mathematical Tools in Metrology III

NASA Astrophysics Data System (ADS)

Ciarlini, P.

The Table of Contents for the book is as follows: * Foreword * Invited Papers * The ISO Guide to the Expression of Uncertainty in Measurement: A Bridge between Statistics and Metrology * Bootstrap Algorithms and Applications * The TTRSs: 13 Oriented Constraints for Dimensioning, Tolerancing & Inspection * Graded Reference Data Sets and Performance Profiles for Testing Software Used in Metrology * Uncertainty in Chemical Measurement * Mathematical Methods for Data Analysis in Medical Applications * High-Dimensional Empirical Linear Prediction * Wavelet Methods in Signal Processing * Software Problems in Calibration Services: A Case Study * Robust Alternatives to Least Squares * Gaining Information from Biomagnetic Measurements * Full Papers * Increase of Information in the Course of Measurement * A Framework for Model Validation and Software Testing in Regression * Certification of Algorithms for Determination of Signal Extreme Values during Measurement * A Method for Evaluating Trends in Ozone-Concentration Data and Its Application to Data from the UK Rural Ozone Monitoring Network * Identification of Signal Components by Stochastic Modelling in Measurements of Evoked Magnetic Fields from Peripheral Nerves * High Precision 3D-Calibration of Cylindrical Standards * Magnetic Dipole Estimations for MCG-Data * Transfer Functions of Discrete Spline Filters * An Approximation Method for the Linearization of Tridimensional Metrology Problems * Regularization Algorithms for Image Reconstruction from Projections * Quality of Experimental Data in Hydrodynamic Research * Stochastic Drift Models for the Determination of Calibration Intervals * Short Communications * Projection Method for Lidar Measurement * Photon Flux Measurements by Regularised Solution of Integral Equations * Correct Solutions of Fit Problems in Different Experimental Situations * An Algorithm for the Nonlinear TLS Problem in Polynomial Fitting * Designing Axially Symmetric Electromechanical Systems of Superconducting Magnetic Levitation in Matlab Environment * Data Flow Evaluation in Metrology * A Generalized Data Model for Integrating Clinical Data and Biosignal Records of Patients * Assessment of Three-Dimensional Structures in Clinical Dentistry * Maximum Entropy and Bayesian Approaches to Parameter Estimation in Mass Metrology * Amplitude and Phase Determination of Sinusoidal Vibration in the Nanometer Range using Quadrature Signals * A Class of Symmetric Compactly Supported Wavelets and Associated Dual Bases * Analysis of Surface Topography by Maximum Entropy Power Spectrum Estimation * Influence of Different Kinds of Errors on Imaging Results in Optical Tomography * Application of the Laser Interferometry for Automatic Calibration of Height Setting Micrometer * Author Index

Joint Research on Scatterometry and AFM Wafer Metrology

NASA Astrophysics Data System (ADS)

Bodermann, Bernd; Buhr, Egbert; Danzebrink, Hans-Ulrich; Bär, Markus; Scholze, Frank; Krumrey, Michael; Wurm, Matthias; Klapetek, Petr; Hansen, Poul-Erik; Korpelainen, Virpi; van Veghel, Marijn; Yacoot, Andrew; Siitonen, Samuli; El Gawhary, Omar; Burger, Sven; Saastamoinen, Toni

2011-11-01

Supported by the European Commission and EURAMET, a consortium of 10 participants from national metrology institutes, universities and companies has started a joint research project with the aim of overcoming current challenges in optical scatterometry for traceable linewidth metrology. Both experimental and modelling methods will be enhanced and different methods will be compared with each other and with specially adapted atomic force microscopy (AFM) and scanning electron microscopy (SEM) measurement systems in measurement comparisons. Additionally novel methods for sophisticated data analysis will be developed and investigated to reach significant reductions of the measurement uncertainties in critical dimension (CD) metrology. One final goal will be the realisation of a wafer based reference standard material for calibration of scatterometers.

SAQP pitch walk metrology using single target metrology

NASA Astrophysics Data System (ADS)

Fang, Fang; Herrera, Pedro; Kagalwala, Taher; Camp, Janay; Vaid, Alok; Pandev, Stilian; Zach, Franz

2017-03-01

Self-aligned quadruple patterning (SAQP) processes have found widespread acceptance in advanced technology nodes to drive device scaling beyond the resolution limitations of immersion scanners. Of the four spaces generated in this process from one lithography pattern two tend to be equivalent as they are derived from the first spacer deposition. The three independent spaces are commonly labelled as α, β and γ. α, β and γ are controlled by multiple process steps including the initial lithographic patterning process, the two mandrel and spacer etches as well as the two spacer depositions. Scatterometry has been the preferred metrology approach, however is restricted to repetitive arrays. In these arrays independent measurements, in particular of alpha and gamma, are not possible due to degeneracy of the standard array targets. . In this work we present a single target approach which lifts the degeneracies commonly encountered while using product relevant layout geometries. We will first describe the metrology approach which includes the previously described SRM (signal response metrology) combined with reference data derived from CD SEM data. The performance of the methodology is shown in figures 1-3. In these figures the optically determined values for alpha, beta and gamma are compared to the CD SEM reference data. The variations are achieved using controlled process experiments varying Mandrel CD and Spacer deposition thicknesses.

Swept Frequency Laser Metrology System

NASA Technical Reports Server (NTRS)

Zhao, Feng (Inventor)

2010-01-01

A swept frequency laser ranging system having sub-micron accuracy that employs multiple common-path heterodyne interferometers, one coupled to a calibrated delay-line for use as an absolute reference for the ranging system. An exemplary embodiment uses two laser heterodyne interferometers to create two laser beams at two different frequencies to measure distance and motions of target(s). Heterodyne fringes generated from reflections off a reference fiducial X(sub R) and measurement (or target) fiducial X(sub M) are reflected back and are then detected by photodiodes. The measured phase changes Delta phi(sub R) and Delta phi (sub m) resulting from the laser frequency swept gives target position. The reference delay-line is the only absolute reference needed in the metrology system and this provides an ultra-stable reference and simple/economical system.

Coherent X-ray beam metrology using 2D high-resolution Fresnel-diffraction analysis.

PubMed

Ruiz-Lopez, M; Faenov, A; Pikuz, T; Ozaki, N; Mitrofanov, A; Albertazzi, B; Hartley, N; Matsuoka, T; Ochante, Y; Tange, Y; Yabuuchi, T; Habara, T; Tanaka, K A; Inubushi, Y; Yabashi, M; Nishikino, M; Kawachi, T; Pikuz, S; Ishikawa, T; Kodama, R; Bleiner, D

2017-01-01

Direct metrology of coherent short-wavelength beamlines is important for obtaining operational beam characteristics at the experimental site. However, since beam-time limitation imposes fast metrology procedures, a multi-parametric metrology from as low as a single shot is desirable. Here a two-dimensional (2D) procedure based on high-resolution Fresnel diffraction analysis is discussed and applied, which allowed an efficient and detailed beamline characterization at the SACLA XFEL. So far, the potential of Fresnel diffraction for beamline metrology has not been fully exploited because its high-frequency fringes could be only partly resolved with ordinary pixel-limited detectors. Using the high-spatial-frequency imaging capability of an irradiated LiF crystal, 2D information of the coherence degree, beam divergence and beam quality factor M 2 were retrieved from simple diffraction patterns. The developed beam metrology was validated with a laboratory reference laser, and then successfully applied at a beamline facility, in agreement with the source specifications.

The Joint Committee for Traceability in Laboratory Medicine (JCTLM) - its history and operation.

PubMed

Jones, Graham R D; Jackson, Craig

2016-01-30

The Joint Committee for Traceability in Laboratory Medicine (JCTLM) was formed to bring together the sciences of metrology, laboratory medicine and laboratory quality management. The aim of this collaboration is to support worldwide comparability and equivalence of measurement results in clinical laboratories for the purpose of improving healthcare. The JCTLM has its origins in the activities of international metrology treaty organizations, professional societies and federations devoted to improving measurement quality in physical, chemical and medical sciences. The three founding organizations, the International Committee for Weights and Measures (CIPM), the International Federation of Clinical Chemistry and Laboratory Medicine (IFCC) and the International Laboratory Accreditation Cooperation (ILAC) are the leaders of this activity. The main service of the JCTLM is a web-based database with a list of reference materials, reference methods and reference measurement services meeting appropriate international standards. This database allows manufacturers to select references for assay traceability and provides support for suppliers of these services. As of mid 2015 the database lists 295 reference materials for 162 analytes, 170 reference measurement procedures for 79 analytes and 130 reference measurement services for 39 analytes. There remains a need for the development and implementation of metrological traceability in many areas of laboratory medicine and the JCTLM will continue to promote these activities into the future. Copyright © 2015 Elsevier B.V. All rights reserved.

Reference metrology in a research fab: the NIST clean calibrations thrust

NASA Astrophysics Data System (ADS)

Dixson, Ronald; Fu, Joe; Orji, Ndubuisi; Renegar, Thomas; Zheng, Alan; Vorburger, Theodore; Hilton, Al; Cangemi, Marc; Chen, Lei; Hernandez, Mike; Hajdaj, Russell; Bishop, Michael; Cordes, Aaron

2009-03-01

In 2004, the National Institute of Standards and Technology (NIST) commissioned the Advanced Measurement Laboratory (AML) - a state-of-the-art, five-wing laboratory complex for leading edge NIST research. The NIST NanoFab - a 1765 m2 (19,000 ft2) clean room with 743 m2 (8000 ft2) of class 100 space - is the anchor of this facility and an integral component of the new Center for Nanoscale Science and Technology (CNST) at NIST. Although the CNST/NanoFab is a nanotechnology research facility with a different strategic focus than a current high volume semiconductor fab, metrology tools still play an important role in the nanofabrication research conducted here. Some of the metrology tools available to users of the NanoFab include stylus profiling, scanning electron microscopy (SEM), and atomic force microscopy (AFM). Since 2001, NIST has collaborated with SEMATECH to implement a reference measurement system (RMS) using critical dimension atomic force microscopy (CD-AFM). NIST brought metrology expertise to the table and SEMATECH provided access to leading edge metrology tools in their clean room facility in Austin. Now, in the newly launched "clean calibrations" thrust at NIST, we are implementing the reference metrology paradigm on several tools in the CNST/NanoFab. Initially, we have focused on calibration, monitoring, and uncertainty analysis for a three-tool set consisting of a stylus profiler, an SEM, and an AFM. Our larger goal is the development of new and supplemental calibrations and standards that will benefit from the Class 100 environment available in the NanoFab and offering our customers calibration options that do not require exposing their samples to less clean environments. Toward this end, we have completed a preliminary evaluation of the performance of these instruments. The results of these evaluations suggest that the achievable uncertainties are generally consistent with our measurement goals.

Hybrid enabled thin film metrology using XPS and optical

NASA Astrophysics Data System (ADS)

Vaid, Alok; Iddawela, Givantha; Mahendrakar, Sridhar; Lenahan, Michael; Hossain, Mainul; Timoney, Padraig; Bello, Abner F.; Bozdog, Cornel; Pois, Heath; Lee, Wei Ti; Klare, Mark; Kwan, Michael; Kang, Byung Cheol; Isbester, Paul; Sendelbach, Matthew; Yellai, Naren; Dasari, Prasad; Larson, Tom

2016-03-01

Complexity of process steps integration and material systems for next-generation technology nodes is reaching unprecedented levels, the appetite for higher sampling rates is on the rise, while the process window continues to shrink. Current thickness metrology specifications reach as low as 0.1A for total error budget - breathing new life into an old paradigm with lower visibility for past few metrology nodes: accuracy. Furthermore, for advance nodes there is growing demand to measure film thickness and composition on devices/product instead of surrogate planar simpler pads. Here we extend our earlier work in Hybrid Metrology to the combination of X-Ray based reference technologies (high performance) with optical high volume manufacturing (HVM) workhorse metrology (high throughput). Our stated goal is: put more "eyes" on the wafer (higher sampling) and enable move to films on pattern structure (control what matters). Examples of 1X front-end applications are used to setup and validate the benefits.

Evaluation of a novel ultra small target technology supporting on-product overlay measurements

NASA Astrophysics Data System (ADS)

Smilde, Henk-Jan H.; den Boef, Arie; Kubis, Michael; Jak, Martin; van Schijndel, Mark; Fuchs, Andreas; van der Schaar, Maurits; Meyer, Steffen; Morgan, Stephen; Wu, Jon; Tsai, Vincent; Wang, Cathy; Bhattacharyya, Kaustuve; Chen, Kai-Hsiung; Huang, Guo-Tsai; Ke, Chih-Ming; Huang, Jacky

2012-03-01

Reducing the size of metrology targets is essential for in-die overlay metrology in advanced semiconductor manufacturing. In this paper, μ-diffraction-based overlay (μDBO) measurements with a YieldStar metrology tool are presented for target-sizes down to 10 × 10 μm2. The μDBO technology enables selection of only the diffraction efficiency information from the grating by efficiently separating it from product structure reflections. Therefore, μDBO targets -even when located adjacent to product environment- give excellent correlation with 40 × 160 μm2 reference targets. Although significantly smaller than standard scribe-line targets, they can achieve total-measurement-uncertainty values of below 0.5 nm on a wide range of product layers. This shows that the new μDBO technique allows for accurate metrology on ultra small in-die targets, while retaining the excellent TMU performance of diffraction-based overlay metrology.

Final Report on the Key Comparison CCM.P-K4.2012 in Absolute Pressure from 1 Pa to 10 kPa

PubMed Central

Ricker, Jacob; Hendricks, Jay; Bock, Thomas; Dominik, Pražák; Kobata, Tokihiko; Torres, Jorge; Sadkovskaya, Irina

2017-01-01

The report summarizes the Consultative Committee for Mass (CCM) key comparison CCM.P-K4.2012 for absolute pressure spanning the range of 1 Pa to 10 000 Pa. The comparison was carried out at six National Metrology Institutes (NMIs), including National Institute of Standards and Technology (NIST), Physikalisch-Technische Bundesanstalt (PTB), Czech Metrology Institute (CMI), National Metrology Institute of Japan (NMIJ), Centro Nacional de Metrología (CENAM), and DI Mendeleyev Institute for Metrology (VNIIM). The comparison was made via a calibrated transfer standard measured at each of the NMIs facilities using their laboratory standard during the period May 2012 to September 2013. The transfer package constructed for this comparison preformed as designed and provided a stable artifact to compare laboratory standards. Overall the participants were found to be statistically equivalent to the key comparison reference value. PMID:28216793

Metrological Traceability in the Social Sciences: A Model from Reading Measurement

NASA Astrophysics Data System (ADS)

Stenner, A. Jackson; Fisher, William P., Jr.

2013-09-01

The central importance of reading ability in learning makes it the natural place to start in formative and summative assessments in education. The Lexile Framework for Reading constitutes a commercial metrological traceability network linking books, test results, instructional materials, and students in elementary and secondary English and Spanish language reading education in the U.S., Canada, Mexico, and Australia.

Metrology in electricity and magnetism: EURAMET activities today and tomorrow

NASA Astrophysics Data System (ADS)

Piquemal, F.; Jeckelmann, B.; Callegaro, L.; Hällström, J.; Janssen, T. J. B. M.; Melcher, J.; Rietveld, G.; Siegner, U.; Wright, P.; Zeier, M.

2017-10-01

Metrology dedicated to electricity and magnetism has changed considerably in recent years. It encompasses almost all modern scientific, industrial, and societal challenges, e.g. the revision of the International System of Units, the profound transformation of industry, changes in energy use and generation, health, and environment, as well as nanotechnologies (including graphene and 2D materials) and quantum engineering. Over the same period, driven by the globalization of worldwide trade, the Mutual Recognition Arrangement (referred to as the CIPM MRA) was set up. As a result, the regional metrology organizations (RMOs) of national metrology institutes have grown in significance. EURAMET is the European RMO and has been very prominent in developing a strategic research agenda (SRA) and has established a comprehensive research programme. This paper reviews the highlights of EURAMET in electrical metrology within the European Metrology Research Programme and its main contributions to the CIPM MRA. In 2012 EURAMET undertook an extensive roadmapping exercise for proposed activities for the next decade which will also be discussed in this paper. This work has resulted in a new SRA of the second largest European funding programme: European Metrology Programme for Innovation and Research.

Scatterometry-based metrology for SAQP pitch walking using virtual reference

NASA Astrophysics Data System (ADS)

Kagalwala, Taher; Vaid, Alok; Mahendrakar, Sridhar; Lenahan, Michael; Fang, Fang; Isbester, Paul; Shifrin, Michael; Etzioni, Yoav; Cepler, Aron; Yellai, Naren; Dasari, Prasad; Bozdog, Cornel

2016-03-01

Advanced technology nodes, 10nm and beyond, employing multi-patterning techniques for pitch reduction pose new process and metrology challenges in maintaining consistent positioning of structural features. Self-Aligned Quadruple Patterning (SAQP) process is used to create the Fins in FinFET devices with pitch values well below optical lithography limits. The SAQP process bares compounding effects from successive Reactive Ion Etch (RIE) and spacer depositions. These processes induce a shift in the pitch value from one fin compared to another neighboring fin. This is known as pitch walking. Pitch walking affects device performance as well as later processes which work on an assumption that there is consistent spacing between fins. In SAQP there are 3 pitch walking parameters of interest, each linked to specific process steps in the flow. These pitch walking parameters are difficult to discriminate at a specific process step by singular evaluation technique or even with reference metrology such as Transmission Electron Microscopy (TEM). In this paper we will utilize a virtual reference to generate a scatterometry model to measure pitch walk for SAQP process flow.

Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference

NASA Astrophysics Data System (ADS)

Kagalwala, Taher; Vaid, Alok; Mahendrakar, Sridhar; Lenahan, Michael; Fang, Fang; Isbester, Paul; Shifrin, Michael; Etzioni, Yoav; Cepler, Aron; Yellai, Naren; Dasari, Prasad; Bozdog, Cornel

2016-10-01

Advanced technology nodes, 10 nm and beyond, employing multipatterning techniques for pitch reduction pose new process and metrology challenges in maintaining consistent positioning of structural features. A self-aligned quadruple patterning (SAQP) process is used to create the fins in FinFET devices with pitch values well below optical lithography limits. The SAQP process bears the compounding effects from successive reactive ion etch and spacer depositions. These processes induce a shift in the pitch value from one fin compared to another neighboring fin. This is known as pitch walking. Pitch walking affects device performance as well as later processes, which work on an assumption that there is consistent spacing between fins. In SAQP, there are three pitch walking parameters of interest, each linked to specific process steps in the flow. These pitch walking parameters are difficult to discriminate at a specific process step by singular evaluation technique or even with reference metrology, such as transmission electron microscopy. We will utilize a virtual reference to generate a scatterometry model to measure pitch walk for SAQP process flow.

Metrological traceability of carbon dioxide measurements in atmosphere and seawater

NASA Astrophysics Data System (ADS)

Rolle, F.; Pessana, E.; Sega, M.

2017-05-01

The accurate determination of gaseous pollutants is fundamental for the monitoring of the trends of these analytes in the environment and the application of the metrological concepts to this field is necessary to assure the reliability of the measurement results. In this work, an overview of the activity carried out at Istituto Nazionale di Ricerca Metrologica to establish the metrological traceability of the measurements of gaseous atmospheric pollutants, in particular of carbon dioxide (CO2), is presented. Two primary methods, the gravimetry and the dynamic dilution, are used for the preparation of reference standards for composition which can be used to calibrate sensors and analytical instrumentation. At present, research is carried out to lower the measurement uncertainties of the primary gas mixtures and to extend their application to the oceanic field. The reason of such investigation is due to the evidence of the changes occurring in seawater carbonate chemistry, connected to the rising level of CO2 in the atmosphere. The well established activity to assure the metrological traceability of CO2 in the atmosphere will be applied to the determination of CO2 in seawater, by developing suitable reference materials for calibration and control of the sensors during their routine use.

Overlay metrology for double patterning processes

NASA Astrophysics Data System (ADS)

Leray, Philippe; Cheng, Shaunee; Laidler, David; Kandel, Daniel; Adel, Mike; Dinu, Berta; Polli, Marco; Vasconi, Mauro; Salski, Bartlomiej

2009-03-01

The double patterning (DPT) process is foreseen by the industry to be the main solution for the 32 nm technology node and even beyond. Meanwhile process compatibility has to be maintained and the performance of overlay metrology has to improve. To achieve this for Image Based Overlay (IBO), usually the optics of overlay tools are improved. It was also demonstrated that these requirements are achievable with a Diffraction Based Overlay (DBO) technique named SCOLTM [1]. In addition, we believe that overlay measurements with respect to a reference grid are required to achieve the required overlay control [2]. This induces at least a three-fold increase in the number of measurements (2 for double patterned layers to the reference grid and 1 between the double patterned layers). The requirements of process compatibility, enhanced performance and large number of measurements make the choice of overlay metrology for DPT very challenging. In this work we use different flavors of the standard overlay metrology technique (IBO) as well as the new technique (SCOL) to address these three requirements. The compatibility of the corresponding overlay targets with double patterning processes (Litho-Etch-Litho-Etch (LELE); Litho-Freeze-Litho-Etch (LFLE), Spacer defined) is tested. The process impact on different target types is discussed (CD bias LELE, Contrast for LFLE). We compare the standard imaging overlay metrology with non-standard imaging techniques dedicated to double patterning processes (multilayer imaging targets allowing one overlay target instead of three, very small imaging targets). In addition to standard designs already discussed [1], we investigate SCOL target designs specific to double patterning processes. The feedback to the scanner is determined using the different techniques. The final overlay results obtained are compared accordingly. We conclude with the pros and cons of each technique and suggest the optimal metrology strategy for overlay control in double patterning processes.

EMRP JRP MetNH3: Towards a Consistent Metrological Infrastructure for Ammonia Measurements in Ambient Air

NASA Astrophysics Data System (ADS)

Leuenberger, Daiana; Balslev-Harder, David; Braban, Christine F.; Ebert, Volker; Ferracci, Valerio; Gieseking, Bjoern; Hieta, Tuomas; Martin, Nicholas A.; Pascale, Céline; Pogány, Andrea; Tiebe, Carlo; Twigg, Marsailidh M.; Vaittinen, Olavi; van Wijk, Janneke; Wirtz, Klaus; Niederhauser, Bernhard

2016-04-01

Measuring ammonia in ambient air is a sensitive and priority issue due to its harmful effects on human health and ecosystems. In addition to its acidifying effect on natural waters and soils and to the additional nitrogen input to ecosystems, ammonia is an important precursor for secondary aerosol formation in the atmosphere. The European Directive 2001/81/EC on "National Emission Ceilings for Certain Atmospheric Pollutants (NEC)" regulates ammonia emissions in the member states. However, there is a lack of regulation regarding certified reference material (CRM), applicable analytical methods, measurement uncertainty, quality assurance and quality control (QC/QA) procedures as well as in the infrastructure to attain metrological traceability. As shown in a key comparison in 2007, there are even discrepancies between reference materials provided by European National Metrology Institutes (NMIs) at amount fraction levels up to three orders of magnitude higher than ambient air levels. MetNH3 (Metrology for ammonia in ambient air), a three-year project that started in June 2014 in the framework of the European Metrology Research Programme (EMRP), aims to reduce the gap between requirements set by the European emission regulations and state-of-the-art of analytical methods and reference materials. The overarching objective of the JRP is to achieve metrological traceability for ammonia measurements in ambient air from primary certified reference material CRM and instrumental standards to the field level. This requires the successful completion of the three main goals, which have been assigned to three technical work packages: To develop improved reference gas mixtures by static and dynamic gravimetric generation methods Realisation and characterisation of traceable preparative calibration standards (in pressurised cylinders as well as mobile generators) of ammonia amount fractions similar to those in ambient air based on existing methods for other reactive analytes. The aimed uncertainty is < 1 % for static mixtures at the 10 to 100 μmol/mol level, and < 3 % for portable dynamic generators in the 0 to 500 nmol/mol amount fraction range. Special emphasis is put on the minimisation of adsorption losses. To develop and characterise laser based optical spectrometric standards Evaluation and characterisation of the applicability of a newly developed open-path as well as of existing extractive measurement techniques as optical transfer standards according to metrological standards. To establish the transfer from high-accuracy standards to field applicable methods Employment of characterised exposure chambers as well as field sites for validation and comparison experiments to test and evaluate the performance of different instruments and measurement methods at ammonia amount fractions of the ambient air. The active exchange in workshops and inter-comparisons, publications in technical journals as well as presentations at relevant conferences and standardisation bodies will transfer the knowledge to stakeholders and end-users. The work has been carried out in the framework of the EMRP. The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union.

[Report of the NEDO project "Research and development to promote the creation and utilization of an intellectual infrastructure: development of reference materials for laboratory medicine" "Development of pure substance-type certified reference materials"].

PubMed

Takatsu, Akiko

2009-06-01

There is an increasing demand to establish a metrological traceability system for in vitro diagnostics and medical devices. Pure substance-type reference materials are playing key roles in metrological traceability, because they form the basis for many traceability chains in chemistry. The National Metrology Institute of Japan (NMIJ), in the National Institute of Advanced Industrial Science and Technology (AIST), has been developing purity-certified reference materials (CRMs) in this field, such as cholesterol, creatinine, and urea. In the New Energy and Industrial Technology Development Organization (NEDO) project, entitled: "Research and Development to Promote the Creation and Utilization of an Intellectual Infrastructure: Development of Reference Materials for Laboratory Medicine", several pure substance-type CRMs were developed. For a pure protein solution CRM, amino acid analysis and nitrogen determination were chosen as the certification methods. The development and certification processes for the C-reactive protein (CRP) solution CRM were completed, with the recombinant human CRP solution as a candidate material. This CRP solution CRM is now available as NMIJ CRM. For cortisol CRM, a purified candidate material and highly pure primary reference material were prepared. Each impure compound in the materials was identified and quantified. The pure cortisol CRM will be available in 2009. These two CRMs provide a traceability link between routine clinical methods and the SI unit.

Catalog of Federal metrology and calibration capabilities: 1980 edition

NASA Astrophysics Data System (ADS)

Leedy, K. O.

1980-09-01

Federal laboratories involved in metrology and calibration are listed. Included is the name of a person to contact at each laboratory telephone number and address. The capabilities of each laboratory are indicated in a tabular listing by agency. To provide geographical distribution, the laboratories are listed by States. In addition, the laboratories are shown on a map by coded number. Other references are described.

Reducing the overlay metrology sensitivity to perturbations of the measurement stack

NASA Astrophysics Data System (ADS)

Zhou, Yue; Park, DeNeil; Gutjahr, Karsten; Gottipati, Abhishek; Vuong, Tam; Bae, Sung Yong; Stokes, Nicholas; Jiang, Aiqin; Hsu, Po Ya; O'Mahony, Mark; Donini, Andrea; Visser, Bart; de Ruiter, Chris; Grzela, Grzegorz; van der Laan, Hans; Jak, Martin; Izikson, Pavel; Morgan, Stephen

2017-03-01

Overlay metrology setup today faces a continuously changing landscape of process steps. During Diffraction Based Overlay (DBO) metrology setup, many different metrology target designs are evaluated in order to cover the full process window. The standard method for overlay metrology setup consists of single-wafer optimization in which the performance of all available metrology targets is evaluated. Without the availability of external reference data or multiwafer measurements it is hard to predict the metrology accuracy and robustness against process variations which naturally occur from wafer-to-wafer and lot-to-lot. In this paper, the capabilities of the Holistic Metrology Qualification (HMQ) setup flow are outlined, in particular with respect to overlay metrology accuracy and process robustness. The significance of robustness and its impact on overlay measurements is discussed using multiple examples. Measurement differences caused by slight stack variations across the target area, called grating imbalance, are shown to cause significant errors in the overlay calculation in case the recipe and target have not been selected properly. To this point, an overlay sensitivity check on perturbations of the measurement stack is presented for improvement of the overlay metrology setup flow. An extensive analysis on Key Performance Indicators (KPIs) from HMQ recipe optimization is performed on µDBO measurements of product wafers. The key parameters describing the sensitivity to perturbations of the measurement stack are based on an intra-target analysis. Using advanced image analysis, which is only possible for image plane detection of μDBO instead of pupil plane detection of DBO, the process robustness performance of a recipe can be determined. Intra-target analysis can be applied for a wide range of applications, independent of layers and devices.

Quantifying Human Response: Linking metrological and psychometric characterisations of Man as a Measurement Instrument

NASA Astrophysics Data System (ADS)

Pendrill, L. R.; Fisher, William P., Jr.

2013-09-01

A better understanding of how to characterise human response is essential to improved person-centred care and other situations where human factors are crucial. Challenges to introducing classical metrological concepts such as measurement uncertainty and traceability when characterising Man as a Measurement Instrument include the failure of many statistical tools when applied to ordinal measurement scales and a lack of metrological references in, for instance, healthcare. The present work attempts to link metrological and psychometric (Rasch) characterisation of Man as a Measurement Instrument in a study of elementary tasks, such as counting dots, where one knows independently the expected value because the measurement object (collection of dots) is prepared in advance. The analysis is compared and contrasted with recent approaches to this problem by others, for instance using signal error fidelity.

Application of Vision Metrology to In-Orbit Measurement of Large Reflector Onboard Communication Satellite for Next Generation Mobile Satellite Communication

NASA Astrophysics Data System (ADS)

Akioka, M.; Orikasa, T.; Satoh, M.; Miura, A.; Tsuji, H.; Toyoshima, M.; Fujino, Y.

2016-06-01

Satellite for next generation mobile satellite communication service with small personal terminal requires onboard antenna with very large aperture reflector larger than twenty meters diameter because small personal terminal with lower power consumption in ground base requires the large onboard reflector with high antenna gain. But, large deployable antenna will deform in orbit because the antenna is not a solid dish but the flexible structure with fine cable and mesh supported by truss. Deformation of reflector shape deteriorate the antenna performance and quality and stability of communication service. However, in case of digital beam forming antenna with phased array can modify the antenna beam performance due to adjustment of excitation amplitude and excitation phase. If we can measure the reflector shape precisely in orbit, beam pattern and antenna performance can be compensated with the updated excitation amplitude and excitation phase parameters optimized for the reflector shape measured every moment. Softbank Corporation and National Institute of Information and Communications Technology has started the project "R&D on dynamic beam control technique for next generation mobile communication satellite" as a contracted research project sponsored by Ministry of Internal Affairs and Communication of Japan. In this topic, one of the problem in vision metrology application is a strong constraints on geometry for camera arrangement on satellite bus with very limited space. On satellite in orbit, we cannot take many images from many different directions as ordinary vision metrology measurement and the available area for camera positioning is quite limited. Feasibility of vision metrology application and general methodology to apply to future mobile satellite communication satellite is to be found. Our approach is as follows: 1) Development of prototyping simulator to evaluate the expected precision for network design in zero order and first order 2) Trial measurement for large structure with similar dimension with large deployable reflector to confirm the validity of the network design and instrumentation. In this report, the overview of this R&D project and the results of feasibility study of network design based on simulations on vision metrology and beam pattern compensation of antenna with very large reflector in orbit is discussed. The feasibility of assumed network design for vision metrology and satisfaction of accuracy requirements are discussed. The feasibility of beam pattern compensation by using accurately measured reflector shape is confirmed with antenna pattern simulation for deformed parabola reflector. If reflector surface of communication satellite can be measured routinely in orbit, the antenna pattern can be compensated and maintain the high performance every moment.

La coherence conceptuelle d'etudiants collegiaux en mecanique Newtonienne et en metrologie

NASA Astrophysics Data System (ADS)

Periard, Martin

This thesis evaluates the coherence of the conceptual network demonstrated by college students in life and applied sciences. This evaluation was based on the analysis of Burt tables issuing from multiple choice questionnaires, on the creation and careful examination of a novel tool, the matrix of specific discrimination coefficients, which will be described in the main text, and on the qualitative analysis of actual laboratory work of students doing an experimentation. At the completion of this project, four research axis have been explored. (1) What is the conceptual coherence demonstrated in Newtonian mechanics? (2) Is the mastery of uncertainty quantification related to the development of logical thinking or to mathematical competency? (3) What is the conceptual coherence demonstrated in the quantification of experimental uncertainty? (4) What are the concrete procedures utilized by students to quantify experimental uncertainty in a semi-directed laboratory context? The main conclusions that emerged from each axis of research can be summerized as follow. (1) The most prevalent erroneous conceptions are not solidly set in a rigid conceptual network. For example, a student successful in a question about Newton's third law (the most difficult subject of the Force Concept Inventory) is just slightly more likely to succeed in another related question than the other participants. Many pairs of questions displays a negative specific discrimination coefficient demonstrating a weak conceptual coherence in pre-test and a somewhat ameliorated conceptual coherence in post-test. (2) If a small proportion of students has demonstrated marked deficiencies in questions related with control of variable and in those related to the relationship between the graphical display of experimental data and a mathematical model, the majority of students can be considered as adequately mastering those subjects. However, almost every student demonstrated a lack of mastery of concepts underlying the quantification of experimental uncertainty and the propagation of uncertainty (heretofore referred to as metrology). No statistically significant correlation has been observed between the three main topics suggesting that they are largely independent cognitive abilities. Burt table has demonstrated a greater degree of conceptual coherence between control of variables questions than suggested by Pearson correlation coefficients. Equivalent question in the topic of metrology did not permit to demonstrate a clear conceptual coherence. (3) Analysis of a questionnaire entirely devoted to metrology has shown erroneous conceptions caused by prior learning (didactical obstacles), erroneous conceptions based on intuitive models and a lack of global comprehension of metrological concepts although some appear to be almost acquired. (4) When doing real experiments in semi-directed laboratory, students demonstrated the same difficulty identified in the questionnaire of 3) which could interpreted as corroborating previously obtained results. However, many unanticipated behaviors related to measurement were observed that could not have been anticipated solely by analyzing answers in the multiple-choice questionnaire. Interviews immediately following each semi-directed laboratory permitted the participants to detail certain aspects of their metrological methodology. Most notably, the use of repeated measurement strategies, their "spontaneous" strategies to quantify uncertainty, and their explanation of numerical estimates of reading uncertainties. Overall, uncertainty propagation algorithms were adequately employed. Many erroneous metrological conceptions seem to resist strongly to be modified by learning. Among others, assignation of the resolution of a digital scale as the uncertainty value and the lack of stacking strategies to diminish uncertainty. The conception that a numerical value cannot be more precise than the tolerance of an instrument seems firmly set. Key words. Burt tables, conceptual coherence, experimental uncertainty, laboratories, metrology, Newtonian mechanics, uncertainty propagation.

MetNH3: Metrology for ammonia in ambient air

NASA Astrophysics Data System (ADS)

Braban, Christine; Twigg, Marsailidh; Tang, Sim; Leuenberger, Daiana; Ferracci, Valerio; Martin, Nick; Pascale, Celine; Hieta, Tuomas; Pogany, Andrea; Persijn, Stefan; van Wijk, Janneke; Gerwig, Holger; Wirtze, Klaus; Tiebe, Carlo; Balslev-Harder, David; Niederhausen, Bernhardt

2015-04-01

Measuring ammonia in ambient air is a sensitive and priority issue due to its harmful effects on human health and ecosystems. The European Directive 2001/81/EC on 'National Emission Ceilings for Certain Atmospheric Pollutants (NEC)' regulates ammonia emissions in the member states. However, there is a lack of regulation to ensure reliable ammonia measurements namely in applicable analytical technology, maximum allowed uncertainty, quality assurance and quality control (QC/QA) procedures as well as in the infrastructure to attain metrological traceability. Validated ammonia measurement data of high quality from air monitoring networks are vitally important for identifying changes due to implementations of environment policies, for understanding where the uncertainties in current emission inventories are derived from and for providing independent verification of atmospheric model predictions. The new EURAMET project MetNH3 aims to develop improved reference gas mixtures by static and dynamic gravimetric generation methods, develop and characterise laser based optical spectrometric standards and establish the transfer from high-accuracy standards to field applicable methods. MetNH3started in June 2014 and in this presentation the first results from the metrological characterisation of a commercially available cavity ring-down spectrometer (CRDS) will be discussed. Also first tests and results from a new design, Controlled Atmosphere Test Facility (CATFAC), which is to be characterised and used to validate the performance of diffusive samplers, denuders and on-line instruments, will be reported. CAFTEC can be used to control test parameters such as ammonia concentration, relative humidity and wind speed. Outline plans for international laboratory and field intercomparisons in 2016 will be presented.

Roles of chemical metrology in electronics industry and associated environment in Korea: a tutorial.

PubMed

Kang, Namgoo; Joong Kim, Kyung; Seog Kim, Jin; Hae Lee, Joung

2015-03-01

Chemical metrology is gaining importance in electronics industry that manufactures semiconductors, electronic displays, and microelectronics. Extensive and growing needs from this industry have raised the significance of accurate measurements of the amount of substances and material properties. For the first time, this paper presents information on how chemical metrology is being applied to meet a variety of needs in the aspects of quality control of electronics products and environmental regulations closely associated with electronics industry. For a better understanding of the roles of the chemical metrology within electronics industry, the recent research activities and results in chemical metrology are presented using typical examples in Korea where electronic industry is leading a national economy. Particular attention is paid to the applications of chemical metrology for advancing emerging electronics technology developments. Such examples are a novel technique for the accurate quantification of gas composition at nano-liter levels within a MEMS package, the surface chemical analysis of a semiconductor device. Typical metrological tools are also presented for the development of certified reference materials for fluorinated greenhouse gases and proficiency testing schemes for heavy metals and chlorinated toxic gas in order to cope properly with environmental issues within electronics industry. In addition, a recent technique is presented for the accurate measurement of the destruction and removal efficiency of a typical greenhouse gas scrubber. Copyright © 2014 Elsevier B.V. All rights reserved.

What metrology can do to improve the quality of your atmospheric ammonia measurements

NASA Astrophysics Data System (ADS)

Leuenberger, Daiana; Martin, Nicholas A.; Pascale, Céline; Guillevic, Myriam; Ackermann, Andreas; Ferracci, Valerio; Cassidy, Nathan; Hook, Josh; Battersby, Ross M.; Tang, Yuk S.; Stevens, Amy C. M.; Jones, Matthew R.; Braban, Christine F.; Gates, Linda; Hangartner, Markus; Sacco, Paolo; Pagani, Diego; Hoffnagle, John A.; Niederhauser, Bernhard

2017-04-01

Measuring ammonia in ambient air is a sensitive and priority issue due to its harmful effects on human health and ecosystems. The European Directive 2001/81/EC on "National Emission Ceilings for Certain Atmospheric Pollutants (NEC)" regulates ammonia emissions in the member states. However, there is a lack of regulation to ensure reliable ammonia measurements, namely in applicable analytical technology, maximum allowed uncertainty, quality assurance and quality control (QC/QA) procedures, as well as in the infrastructure to attain metrological traceability, i.e. that the results of measurements are traceable to SI-units through an unbroken chain of calibrations. In the framework of the European Metrology Research Programme (EMRP) project on the topic "Metrology for Ammonia in Ambient Air" (MetNH3), European national metrology institutes (NMI's) have joined to tackle the issue of generating SI-traceable reference material, i.e. generate reference gas mixtures containing known amount fractions of NH3.This requires special infrastructure and analytical techniques: Measurements of ambient ammonia are commonly carried out with diffusive samplers or by active sampling with denuders, but such techniques have not yet been extensively validated. Improvements in the metrological traceability may be achieved through the determination of NH3 diffusive sampling rates using ammonia Primary Standard Gas Mixtures (PSMs), developed by gravimetry at the National Physical Laboratory NPL and a controlled atmosphere test facility in combination with on-line monitoring with a cavity ring-down spectrometer. The Federal Institute of Metrology METAS has developed an infrastructure to generate SI-traceable NH3 reference gas mixtures dynamically in the amount fraction range 0.5-500 nmol/mol (atmospheric concentrations) and with uncertainties UNH3 <3%. The infrastructure consists of a stationary as well as a mobile device for full flexibility for calibrations in the laboratory and in the field. Both devices apply the method of temperature and pressure dependant permeation of a pure substance through a membrane into a stream of pre-purified matrix gas and subsequent dilution to required amount fractions. All relevant parameters are fully traceable to SI-units. Extractive optical analysers can be connected directly to both, stationary and mobile systems for calibration. Moreover, the resulting gas mixture can also be pressurised into coated cylinders by cryo-filling. The mobile system as well as these cylinders can be applied for calibrations of optical instruments in other laboratories and in the field. In addition, an SI-traceable dilution system based on a cascade of critical orifices has been established to dilute NH3 mixtures in the order of μmol/mol stored in cylinders. It is planned to apply this system to calibrate and re-sample gas mixtures in cylinders due to its very economical gas use. Here we present insights into the development of said infrastructure and results performance tests. Moreover, we include results of the study on adsorption/desorption effects in dry as well as humidified matrix gas into the discussion on the generation of reference gas mixtures. Acknowledgement: This work was supported by the European Metrology Research Programme (EMRP). The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union.

Flatness metrology based on small-angle deflectometric procedures with electronic tiltmeters

NASA Astrophysics Data System (ADS)

Ehret, G.; Laubach, S.; Schulz, M.

2017-06-01

The measurement of optical flats, e. g. synchrotron or XFEL mirrors, with single nanometer topography uncertainty is still challenging. At PTB, we apply for this task small-angle deflectometry in which the angle between the direction of the beam sent to the surface and the beam detected is small. Conventional deflectometric systems measure the surface angle with autocollimators whose light beam also represents the straightness reference. An advanced flatness metrology system was recently implemented at PTB that separates the straightness reference task from the angle detection task. We call it `Exact Autocollimation Deflectometric Scanning' because the specimen is slightly tilted in such a way that at every scanning position the specimen is `exactly' perpendicular to the reference light beam directed by a pentaprism to the surface under test. The tilt angle of the surface is then measured with an additional autocollimator. The advantage of the EADS method is that the two tasks (straightness reference and measurement of surface slope) are separated and each of these can be optimized independently. The idea presented in this paper is to replace this additional autocollimator by one or more electro-mechanical tiltmeters, which are typically faster and have a higher resolution than highly accurate commercially available autocollimators. We investigate the point stability and the linearity of a highly accurate electronic tiltmeter. The pros and cons of using tiltmeters in flatness metrology are discussed.

The role of metrology in mediating and mobilizing the language and culture of scientific facts

NASA Astrophysics Data System (ADS)

Fisher, W. P., Jr.; Stenner, A. J.

2015-02-01

The self-conscious awareness of language and its use is arguably nowhere more intense than in metrology. The careful and deliberate coordination and alignment of shared metrological frames of reference for theory, experiment, and practical application have been characteristics of scientific culture at least since the origins of the SI units in revolutionary France. Though close attention has been focused on the logical and analytical aspects of language use in science, little concern has been shown for understanding how the social and historical aspects of everyday language may have foreshadowed and influenced the development and character of metrological language, especially relative to the inevitably partial knowledge possessed by any given stakeholder participating in the scientific enterprise. Insight in this regard may be helpful in discerning how and if an analogous role for metrology might be created in psychology and the social sciences. It may be that the success of psychology as a science will depend less on taking physics as the relevant model than on attending to the interplay of concepts, models, and social organization that make any culture effective.

Metrology in Medicine: From Measurements to Decision, with Specific Reference to Anesthesia and Intensive Care

PubMed Central

Imhoff, Michael; Cecconi, Maurizio

2015-01-01

Metrology is the science of measurements. Although of critical importance in medicine and especially in critical care, frequent confusion in terms and definitions impact either interphysician communications or understanding of manufacturers’ and engineers’ instructions and limitations when using devices. In this review, we first list the terms defined by the International Bureau of Weights and Measures regarding quantities and units, measurements, devices for measurement, properties of measuring devices, and measurement standards. The traditional tools for assessing the most important measurement quality criteria are also reviewed with clinical examples for diagnosis, alarm, and titration purposes, as well as for assessing the uncertainty of reference methods. PMID:25625255

Assessing measurement uncertainty in meteorology in urban environments

NASA Astrophysics Data System (ADS)

Curci, S.; Lavecchia, C.; Frustaci, G.; Paolini, R.; Pilati, S.; Paganelli, C.

2017-10-01

Measurement uncertainty in meteorology has been addressed in a number of recent projects. In urban environments, uncertainty is also affected by local effects which are more difficult to deal with than for synoptic stations. In Italy, beginning in 2010, an urban meteorological network (Climate Network®) was designed, set up and managed at national level according to high metrological standards and homogeneity criteria to support energy applications. The availability of such a high-quality operative automatic weather station network represents an opportunity to investigate the effects of station siting and sensor exposure and to estimate the related measurement uncertainty. An extended metadata set was established for the stations in Milan, including siting and exposure details. Statistical analysis on an almost 3-year-long operational period assessed network homogeneity, quality and reliability. Deviations from reference mean values were then evaluated in selected low-gradient local weather situations in order to investigate siting and exposure effects. In this paper the methodology is depicted and preliminary results of its application to air temperature discussed; this allowed the setting of an upper limit of 1 °C for the added measurement uncertainty at the top of the urban canopy layer.

Metrological aspects of enzyme production

NASA Astrophysics Data System (ADS)

Kerber, T. M.; Dellamora-Ortiz, G. M.; Pereira-Meirelles, F. V.

2010-05-01

Enzymes are frequently used in biotechnology to carry out specific biological reactions, either in industrial processes or for the production of bioproducts and drugs. Microbial lipases are an important group of biotechnologically valuable enzymes that present widely diversified applications. Lipase production by microorganisms is described in several published papers; however, none of them refer to metrological evaluation and the estimation of the uncertainty in measurement. Moreover, few of them refer to process optimization through experimental design. The objectives of this work were to enhance lipase production in shaken-flasks with Yarrowia lipolytica cells employing experimental design and to evaluate the uncertainty in measurement of lipase activity. The highest lipolytic activity obtained was about three- and fivefold higher than the reported activities of CRMs BCR-693 and BCR-694, respectively. Lipase production by Y. lipolytica cells aiming the classification as certified reference material is recommended after further purification and stability studies.

Phase-locking to a free-space terahertz comb for metrological-grade terahertz lasers.

PubMed

Consolino, L; Taschin, A; Bartolini, P; Bartalini, S; Cancio, P; Tredicucci, A; Beere, H E; Ritchie, D A; Torre, R; Vitiello, M S; De Natale, P

2012-01-01

Optical frequency comb synthesizers have represented a revolutionary approach to frequency metrology, providing a grid of frequency references for any laser emitting within their spectral coverage. Extending the metrological features of optical frequency comb synthesizers to the terahertz domain would be a major breakthrough, due to the widespread range of accessible strategic applications and the availability of stable, high-power and widely tunable sources such as quantum cascade lasers. Here we demonstrate phase-locking of a 2.5 THz quantum cascade laser to a free-space comb, generated in a LiNbO(3) waveguide and covering the 0.1-6 THz frequency range. We show that even a small fraction (<100 nW) of the radiation emitted from the quantum cascade laser is sufficient to generate a beat note suitable for phase-locking to the comb, paving the way to novel metrological-grade terahertz applications, including high-resolution spectroscopy, manipulation of cold molecules, astronomy and telecommunications.

Contour metrology using critical dimension atomic force microscopy

NASA Astrophysics Data System (ADS)

Orji, Ndubuisi G.; Dixson, Ronald G.; Vladár, András E.; Ming, Bin; Postek, Michael T.

2012-03-01

The critical dimension atomic force microscope (CD-AFM), which is used as a reference instrument in lithography metrology, has been proposed as a complementary instrument for contour measurement and verification. Although data from CD-AFM is inherently three dimensional, the planar two-dimensional data required for contour metrology is not easily extracted from the top-down CD-AFM data. This is largely due to the limitations of the CD-AFM method for controlling the tip position and scanning. We describe scanning techniques and profile extraction methods to obtain contours from CD-AFM data. We also describe how we validated our technique, and explain some of its limitations. Potential sources of error for this approach are described, and a rigorous uncertainty model is presented. Our objective is to show which data acquisition and analysis methods could yield optimum contour information while preserving some of the strengths of CD-AFM metrology. We present comparison of contours extracted using our technique to those obtained from the scanning electron microscope (SEM), and the helium ion microscope (HIM).

Overcoming the Invisibility of Metrology: A Reading Measurement Network for Education and the Social Sciences

NASA Astrophysics Data System (ADS)

Fisher, William P., Jr.; Stenner, A. Jackson

2013-09-01

The public and researchers in psychology and the social sciences are largely unaware of the huge resources invested in metrology and standards in science and commerce, for understandable reasons, but with unfortunate consequences. Measurement quality varies widely in fields lacking uniform standards, making it impossible to coordinate local behaviours and decisions in tune with individually observed instrument readings. However, recent developments in reading measurement have effectively instituted metrological traceability methods within elementary and secondary English and Spanish language reading education in the U.S., Canada, Mexico, and Australia. Given established patterns in the history of science, it may be reasonable to expect that widespread routine reproduction of controlled effects expressed in uniform units in the social sciences may lead to significant developments in theory and practice.

[On the way to national reference system of laboratory medicine].

PubMed

Muravskaia, N P; Men'shikov, V V

2014-10-01

The application of standard samples and reference techniques of implementation of measurements is needed for a valid support of reliability of analyses applied in clinical diagnostic laboratories. They play role of landmarks under metrologic monitoring, calibration of devices and control of quality of results. The article presents analysis of shortcomings interfering with formation of national reference system in Russia harmonized with possibilities provided by international organizations. Among them are the joint Committee on metrologic monitoring in laboratory medicine under the auspices of the International Bureau of Weights and Measures, the International Federation of clinical chemistry and laboratory medicine, etc. The results of the recent development of national normative documents, standard samples and techniques assisted by the authors of article are considered. They are the first steps to organization of national reference system which would comprise all range of modern analytical technologies of laboratory medicine. The national and international measures are proposed to enhance the promptest resolving of task of organization of national reference system for laboratory medicine in the interests of increasing of effectiveness of medical care to citizen of Russia.

Optimal and secure measurement protocols for quantum sensor networks

NASA Astrophysics Data System (ADS)

Eldredge, Zachary; Foss-Feig, Michael; Gross, Jonathan A.; Rolston, S. L.; Gorshkov, Alexey V.

2018-04-01

Studies of quantum metrology have shown that the use of many-body entangled states can lead to an enhancement in sensitivity when compared with unentangled states. In this paper, we quantify the metrological advantage of entanglement in a setting where the measured quantity is a linear function of parameters individually coupled to each qubit. We first generalize the Heisenberg limit to the measurement of nonlocal observables in a quantum network, deriving a bound based on the multiparameter quantum Fisher information. We then propose measurement protocols that can make use of Greenberger-Horne-Zeilinger (GHZ) states or spin-squeezed states and show that in the case of GHZ states the protocol is optimal, i.e., it saturates our bound. We also identify nanoscale magnetic resonance imaging as a promising setting for this technology.

Coherent double-color interference microscope for traceable optical surface metrology

NASA Astrophysics Data System (ADS)

Malinovski, I.; França, R. S.; Bessa, M. S.; Silva, C. R.; Couceiro, I. B.

2016-06-01

Interference microscopy is an important field of dimensional surface metrology because it provides direct traceability of the measurements to the SI base unit definition of the metre. With a typical measurement range from micrometres to nanometres interference microscopy (IM) covers the gap between classic metrology and nanometrology, providing continuous transfer of dimensional metrology into new areas of nanoscience and nanotechnology. Therefore IM is considered to be an indispensable tool for traceable transfer of the metre unit to different instruments. We report here the metrological study of an absolute Linnik interference microscope (IM) based on two frequency stabilized lasers. The design permits the flexible use of both lasers for measurements depending on the demand of the concrete measurement task. By principle of operation IM is combination of imaging and phase-shifting interferometry (PSI). The traceability is provided by the wavelength reference, that is, a He-Ne 633 nm stabilized laser. The second laser source, that is, a Blue-Green 488 nm grating stabilized laser diode, is used for improvements of resolution, and also for resolving integer fringe discontinuities on sharp features of the surface. The IM was optimized for surface height metrology. We have performed the study of the systematic effects of the measurements. This study allowed us to improve the hardware and software of IM and to find corrections for main systematic errors. The IM is purposed for 1D to 3D height metrology and surface topography in an extended range from nanometres to micrometres. The advantages and disadvantages of the design and developed methods are discussed.

Line-width roughness of advanced semiconductor features by using FIB and planar-TEM as reference metrology

NASA Astrophysics Data System (ADS)

Takamasu, Kiyoshi; Takahashi, Satoru; Kawada, Hiroki; Ikota, Masami

2018-03-01

LER (Line Edge Roughness) and LWR (Line Width Roughness) of the semiconductor device are an important evaluation scale of the performance of the device. Conventionally, LER and LWR is evaluated from CD-SEM (Critical Dimension Scanning Electron Microscope) images. However, CD-SEM measurement has a problem that high frequency random noise is large, and resolution is not sufficiently high. For random noise of CD-SEM measurement, some techniques are proposed. In these methods, it is necessary to set parameters for model and processing, and it is necessary to verify the correctness of these parameters using reference metrology. We have already proposed a novel reference metrology using FIB (Focused Ion Beam) process and planar-TEM (Transmission Electron Microscope) method. In this study, we applied the proposed method to three new samples such as SAQP (Self-Aligned Quadruple Patterning) FinFET device, EUV (Extreme Ultraviolet Lithography) conventional resist, and EUV new material resist. LWR and PSD (Power Spectral Density) of LWR are calculated from the edge positions on planar-TEM images. We confirmed that LWR and PSD of LWR can be measured with high accuracy and evaluated the difference by the proposed method. Furthermore, from comparisons with PSD of the same sample by CD-SEM, the validity of measurement of PSD and LWR by CD-SEM can be verified.

Virtual overlay metrology for fault detection supported with integrated metrology and machine learning

NASA Astrophysics Data System (ADS)

Lee, Hong-Goo; Schmitt-Weaver, Emil; Kim, Min-Suk; Han, Sang-Jun; Kim, Myoung-Soo; Kwon, Won-Taik; Park, Sung-Ki; Ryan, Kevin; Theeuwes, Thomas; Sun, Kyu-Tae; Lim, Young-Wan; Slotboom, Daan; Kubis, Michael; Staecker, Jens

2015-03-01

While semiconductor manufacturing moves toward the 7nm node for logic and 15nm node for memory, an increased emphasis has been placed on reducing the influence known contributors have toward the on product overlay budget. With a machine learning technique known as function approximation, we use a neural network to gain insight to how known contributors, such as those collected with scanner metrology, influence the on product overlay budget. The result is a sufficiently trained function that can approximate overlay for all wafers exposed with the lithography system. As a real world application, inline metrology can be used to measure overlay for a few wafers while using the trained function to approximate overlay vector maps for the entire lot of wafers. With the approximated overlay vector maps for all wafers coming off the track, a process engineer can redirect wafers or lots with overlay signatures outside the standard population to offline metrology for excursion validation. With this added flexibility, engineers will be given more opportunities to catch wafers that need to be reworked, resulting in improved yield. The quality of the derived corrections from measured overlay metrology feedback can be improved using the approximated overlay to trigger, which wafers should or shouldn't be, measured inline. As a development or integration engineer the approximated overlay can be used to gain insight into lots and wafers used for design of experiments (DOE) troubleshooting. In this paper we will present the results of a case study that follows the machine learning function approximation approach to data analysis, with production overlay measured on an inline metrology system at SK hynix.

The future of 2D metrology for display manufacturing

NASA Astrophysics Data System (ADS)

Sandstrom, Tor; Wahlsten, Mikael; Park, Youngjin

2016-10-01

The race to 800 PPI and higher in mobile devices and the transition to OLED displays are driving a dramatic development of mask quality: resolution, CDU, registration, and complexity. 2D metrology for large area masks is necessary and must follow the roadmap. Driving forces in the market place point to continued development of even more dense displays. State-of-the-art metrology has proven itself capable of overlay below 40 nm and registration below 65 nm for G6 masks. Future developments include incoming and recurrent measurements of pellicalized masks at the panel maker's factory site. Standardization of coordinate systems across supplier networks is feasible. This will enable better yield and production economy for both mask and panel maker. Better distortion correction methods will give better registration on the panels and relax the flatness requirements of the mask blanks. If panels are measured together with masks and the results are used to characterize the aligners, further quality and yield improvements are possible. Possible future developments include in-cell metrology and integration with other instruments in the same platform.

Final report on the key comparison CCM.P-K4.2012 in absolute pressure from 1 Pa to 10 kPa

NASA Astrophysics Data System (ADS)

Ricker, Jacob; Hendricks, Jay; Bock, Thomas; Dominik, Pražák; Kobata, Tokihiko; Torres, Jorge; Sadkovskaya, Irina

2017-01-01

The report summarizes the Consultative Committee for Mass (CCM) key comparison CCM.P-K4.2012 for absolute pressure spanning the range of 1 Pa to 10 000 Pa. The comparison was carried out at six National Metrology Institutes (NMIs), including National Institute of Standards and Technology (NIST), Physikalisch-Technische Bundesanstalt (PTB), Czech Metrology Institute (CMI), National Metrology Institute of Japan (NMIJ), Centro Nacional de Metrología (CENAM), and DI Mendeleyev Institute for Metrology (VNIIM). The comparison was made via a calibrated transfer standard measured at each of the NMIs facilities using their laboratory standard during the period May 2012 to September 2013. The transfer package constructed for this comparison preformed as designed and provided a stable artifact to compare laboratory standards. Overall the participants were found to be statistically equivalent to the key comparison reference value. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Metrology Optical Power Budgeting in SIM Using Statistical Analysis Techniques

NASA Technical Reports Server (NTRS)

Kuan, Gary M

2008-01-01

The Space Interferometry Mission (SIM) is a space-based stellar interferometry instrument, consisting of up to three interferometers, which will be capable of micro-arc second resolution. Alignment knowledge of the three interferometer baselines requires a three-dimensional, 14-leg truss with each leg being monitored by an external metrology gauge. In addition, each of the three interferometers requires an internal metrology gauge to monitor the optical path length differences between the two sides. Both external and internal metrology gauges are interferometry based, operating at a wavelength of 1319 nanometers. Each gauge has fiber inputs delivering measurement and local oscillator (LO) power, split into probe-LO and reference-LO beam pairs. These beams experience power loss due to a variety of mechanisms including, but not restricted to, design efficiency, material attenuation, element misalignment, diffraction, and coupling efficiency. Since the attenuation due to these sources may degrade over time, an accounting of the range of expected attenuation is needed so an optical power margin can be book kept. A method of statistical optical power analysis and budgeting, based on a technique developed for deep space RF telecommunications, is described in this paper and provides a numerical confidence level for having sufficient optical power relative to mission metrology performance requirements.

Elimination of 'ghost'-effect-related systematic error in metrology of X-ray optics with a long trace profiler

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yashchuk, Valeriy V.; Irick, Steve C.; MacDowell, Alastair A.

2005-04-28

A data acquisition technique and relevant program for suppression of one of the systematic effects, namely the ''ghost'' effect, of a second generation long trace profiler (LTP) is described. The ''ghost'' effect arises when there is an unavoidable cross-contamination of the LTP sample and reference signals into one another, leading to a systematic perturbation in the recorded interference patterns and, therefore, a systematic variation of the measured slope trace. Perturbations of about 1-2 {micro}rad have been observed with a cylindrically shaped X-ray mirror. Even stronger ''ghost'' effects show up in an LTP measurement with a mirror having a toroidal surfacemore » figure. The developed technique employs separate measurement of the ''ghost''-effect-related interference patterns in the sample and the reference arms and then subtraction of the ''ghost'' patterns from the sample and the reference interference patterns. The procedure preserves the advantage of simultaneously measuring the sample and reference signals. The effectiveness of the technique is illustrated with LTP metrology of a variety of X-ray mirrors.« less

Fast and accurate: high-speed metrological large-range AFM for surface and nanometrology

NASA Astrophysics Data System (ADS)

Dai, Gaoliang; Koenders, Ludger; Fluegge, Jens; Hemmleb, Matthias

2018-05-01

Low measurement speed remains a major shortcoming of the scanning probe microscopic technique. It not only leads to a low measurement throughput, but a significant measurement drift over the long measurement time needed (up to hours or even days). To overcome this challenge, PTB, the national metrology institute of Germany, has developed a high-speed metrological large-range atomic force microscope (HS Met. LR-AFM) capable of measuring speeds up to 1 mm s‑1. This paper has introduced the design concept in detail. After modelling scanning probe microscopic measurements, our results suggest that the signal spectrum of the surface to be measured is the spatial spectrum of the surface scaled by the scanning speed. The higher the scanning speed , the broader the spectrum to be measured. To realise an accurate HS Met. LR-AFM, our solution is to combine different stages/sensors synchronously in measurements, which provide a much larger spectrum area for high-speed measurement capability. Two application examples have been demonstrated. The first is a new concept called reference areal surface metrology. Using the developed HS Met. LR-AFM, surfaces are measured accurately and traceably at a speed of 500 µm s‑1 and the results are applied as a reference 3D data map of the surfaces. By correlating the reference 3D data sets and 3D data sets of tools under calibration, which are measured at the same surface, it has the potential to comprehensively characterise the tools, for instance, the spectrum properties of the tools. The investigation results of two commercial confocal microscopes are demonstrated, indicating very promising results. The second example is the calibration of a kind of 3D nano standard, which has spatially distributed landmarks, i.e. special unique features defined by 3D-coordinates. Experimental investigations confirmed that the calibration accuracy is maintained at a measurement speed of 100 µm s‑1, which improves the calibration efficiency by a factor of 10.

Gravimetric preparation and characterization of primary reference solutions of molybdenum and rhodium.

PubMed

Kaltenbach, Angela; Noordmann, Janine; Görlitz, Volker; Pape, Carola; Richter, Silke; Kipphardt, Heinrich; Kopp, Gernot; Jährling, Reinhard; Rienitz, Olaf; Güttler, Bernd

2015-04-01

Gravimetrically prepared mono-elemental reference solutions having a well-known mass fraction of approximately 1 g/kg (or a mass concentration of 1 g/L) define the very basis of virtually all measurements in inorganic analysis. Serving as the starting materials of all standard/calibration solutions, they link virtually all measurements of inorganic analytes (regardless of the method applied) to the purity of the solid materials (high-purity metals or salts) they were prepared from. In case these solid materials are characterized comprehensively with respect to their purity, this link also establishes direct metrological traceability to The International System of Units (SI). This, in turn, ensures the comparability of all results on the highest level achievable. Several national metrology institutes (NMIs) and designated institutes (DIs) have been working for nearly two decades in close cooperation with commercial producers on making an increasing number of traceable reference solutions available. Besides the comprehensive characterization of the solid starting materials, dissolving them both loss-free and completely under strict gravimetric control is a challenging problem in the case of several elements like molybdenum and rhodium. Within the framework of the European Metrology Research Programme (EMRP), in the Joint Research Project (JRP) called SIB09 Primary standards for challenging elements, reference solutions of molybdenum and rhodium were prepared directly from the respective metals with a relative expanded uncertainty associated with the mass fraction of U rel(w) < 0.05 %. To achieve this, a microwave-assisted digestion procedure for Rh and a hotplate digestion procedure for Mo were developed along with highly accurate and precise inductively coupled plasma optical emission spectrometry (ICP OES) and multicollector inductively coupled plasma mass spectrometry (MC-ICP-MS) methods required to assist with the preparation and as dissemination tools.

Metrology and ionospheric observation standards

NASA Astrophysics Data System (ADS)

Panshin, Evgeniy; Minligareev, Vladimir; Pronin, Anton

Accuracy and ionospheric observation validity are urgent trends nowadays. WMO, URSI and national metrological and standardisation services bring forward requirements and descriptions of the ionospheric observation means. Researches in the sphere of metrological and standardisation observation moved to the next level in the Russian Federation. Fedorov Institute of Applied Geophysics (IAG) is in charge of ionospheric observation in the Russian Federation and the National Technical Committee, TC-101 , which was set up on the base of IAG- of the standardisation in the sphere. TC-101 can be the platform for initiation of the core international committee in the network of ISO The new type of the ionosounde “Parus-A” is engineered, which is up to the national requirements. “Parus-A” calibration and test were conducted by National metrological Institute (NMI) -D.I. Mendeleyev Institute for Metrology (VNIIM), signed CIMP MRA in 1991. VNIIM is a basic NMI in the sphere of Space weather (including ionospheric observations), the founder of which was celebrated chemist and metrologist Dmitriy I. Mendeleyev. Tests and calibration were carried out for the 1st time throughout 50-year-history of ionosonde exploitation in Russia. The following metrological characteristics were tested: -measurement range of radiofrequency time delay 0.5-10 ms; -time measurement inaccuracy of radio- frequency pulse ±12mcs; -frequency range of radio impulse 1-20 MHz ; -measurement inaccuracy of radio impulse carrier frequency± 5KHz. For example, the sound impulse simulator that was built-in in the ionosounde was used for measurement range of radiofrequency time delay testing. The number of standards on different levels is developed. - “Ionospheric observation guidance”; - “The Earth ionosphere. Terms and definitions”.

Current state of the art in small mass and force metrology within the International System of Units

NASA Astrophysics Data System (ADS)

Shaw, Gordon A.

2018-07-01

This review article summarizes new scientific trends in research for metrology of small mass (1 mg and lower) and small force (10 micronewtons and lower). After a brief introduction to the field, this paper provides an overview of recent developments in methods that demonstrate traceability to the International System of Units (SI) with emphasis on the implications of redefining the kilogram in terms of Planck’s constant. Specific research applications include new metrology facilities, calibration of small mass and force references such as milligram to submilligram masses or atomic force microscope (AFM) cantilevers, and laser power measurement using radiation pressure forces. Also discussed are recent scientific developments that may impact the field moving forward in the study of ultrasmall forces present in trapped and cooled quantum mechanical systems, resonant micro- and nanomechanical mass sensors, and other areas that are potentially well suited for SI metrology. The work reviewed is not intended as a comprehensive review of all research in which small forces are measured, but rather as an overview of a field in which the accurate measurement of small mass and force with quantified uncertainty is the primary goal.

Certified reference material of volatile organic compounds for environmental analysis: BTEX in methanol.

PubMed

Neves, Laura A; Almeida, Renato R R; Rego, Eliane P; Rodrigues, Janaína Marques; de Carvalho, Lucas Junqueira; de M Goulart, Ana Letícia

2015-04-01

The Brazilian Metrology Institute (National Institute of Metrology, Quality, and Technology, Inmetro) has been developing a certified reference material (CRM) of the volatile organic compounds benzene; toluene; ethylbenzene; and ortho, meta, and para-xylenes (BTEX) in methanol, to ensure quality control for environmental-analysis measurements. The objective of this paper is to present the results of certification studies: uncertainty estimates related to characterization, a homogeneity study, and a stability study on a single lot of CRM composed of BTEX in methanol. The method used analysis of variance (ANOVA), a statistical tool, to evaluate the homogeneity and stability of the BTEX CRM, which complies with ISO Guide 30 series. The homogeneity and stability of the BTEX CRM was confirmed for all analytes and their respective properties. All the procedures used in this study complied with ISO GUIDE 34, ISO GUIDE 35, and the guide to the expression of uncertainty of measurement (GUM).

A universal quantum module for quantum communication, computation, and metrology

NASA Astrophysics Data System (ADS)

Hanks, Michael; Lo Piparo, Nicolò; Trupke, Michael; Schmiedmayer, Jorg; Munro, William J.; Nemoto, Kae

2017-08-01

In this work, we describe a simple module that could be ubiquitous for quantum information based applications. The basic modules comprises a single NV- center in diamond embedded in an optical cavity, where the cavity mediates interactions between photons and the electron spin (enabling entanglement distribution and efficient readout), while the nuclear spins constitutes a long-lived quantum memories capable of storing and processing quantum information. We discuss how a network of connected modules can be used for distributed metrology, communication and computation applications. Finally, we investigate the possible use of alternative diamond centers (SiV/GeV) within the module and illustrate potential advantages.

Fundamental limits of measurement in telecommunications: Experimental and modeling studies in a test optical network on proposal for the reform of telecommunication quantitations

NASA Astrophysics Data System (ADS)

Egan, James; McMillan, Normal; Denieffe, David

2011-08-01

Proposals for a review of the limits of measurement for telecommunications are made. The measures are based on adapting work from the area of chemical metrology for the field of telecommunications. Currie has introduced recommendations for defining the limits of measurement in chemical metrology and has identified three key fundamental limits of measurement. These are the critical level, the detection limit and the determination limit. Measurements on an optical system are used to illustrate the utility of these measures and discussion is given into the advantages of using these fundamental quantitations over existing methods.

Metrology of human-based and other qualitative measurements

NASA Astrophysics Data System (ADS)

Pendrill, Leslie; Petersson, Niclas

2016-09-01

The metrology of human-based and other qualitative measurements is in its infancy—concepts such as traceability and uncertainty are as yet poorly developed. This paper reviews how a measurement system analysis approach, particularly invoking as performance metric the ability of a probe (such as a human being) acting as a measurement instrument to make a successful decision, can enable a more general metrological treatment of qualitative observations. Measures based on human observations are typically qualitative, not only in sectors, such as health care, services and safety, where the human factor is obvious, but also in customer perception of traditional products of all kinds. A principal challenge is that the usual tools of statistics normally employed for expressing measurement accuracy and uncertainty will probably not work reliably if relations between distances on different portions of scales are not fully known, as is typical of ordinal or other qualitative measurements. A key enabling insight is to connect the treatment of decision risks associated with measurement uncertainty to generalized linear modelling (GLM). Handling qualitative observations in this way unites information theory, the perceptive identification and choice paradigms of psychophysics. The Rasch invariant measure psychometric GLM approach in particular enables a proper treatment of ordinal data; a clear separation of probe and item attribute estimates; simple expressions for instrument sensitivity; etc. Examples include two aspects of the care of breast cancer patients, from diagnosis to rehabilitation. The Rasch approach leads in turn to opportunities of establishing metrological references for quality assurance of qualitative measurements. In psychometrics, one could imagine a certified reference for knowledge challenge, for example, a particular concept in understanding physics or for product quality of a certain health care service. Multivariate methods, such as Principal Component Regression, can also be improved by exploiting the increased resolution of the Rasch approach.

Iron Disilicide as High-Temperature Reference Material for Traceable Measurements of Seebeck Coefficient Between 300 K and 800 K

NASA Astrophysics Data System (ADS)

Ziolkowski, Pawel; Stiewe, Christian; de Boor, Johannes; Druschke, Ines; Zabrocki, Knud; Edler, Frank; Haupt, Sebastian; König, Jan; Mueller, Eckhard

2017-01-01

Thermoelectric generators (TEGs) convert heat to electrical energy by means of the Seebeck effect. The Seebeck coefficient is a central thermoelectric material property, measuring the magnitude of the thermovoltage generated in response to a temperature difference across a thermoelectric material. Precise determination of the Seebeck coefficient provides the basis for reliable performance assessment in materials development in the field of thermoelectrics. For several reasons, measurement uncertainties of up to 14% can often be observed in interlaboratory comparisons of temperature-dependent Seebeck coefficient or in error analyses on currently employed instruments. This is still too high for an industrial benchmark and insufficient for many scientific investigations and technological developments. The TESt (thermoelectric standardization) project was launched in 2011, funded by the German Federal Ministry of Education and Research (BMBF), to reduce measurement uncertainties, engineer traceable and precise thermoelectric measurement techniques for materials and TEGs, and develop reference materials (RMs) for temperature-dependent determination of the Seebeck coefficient. We report herein the successful development and qualification of cobalt-doped β-iron disilicide ( β-Fe0.95Co0.05Si2) as a RM for high-temperature thermoelectric metrology. A brief survey on technological processes for manufacturing and machining of samples is presented. Focus is placed on metrological qualification of the iron disilicide, results of an international round-robin test, and final certification as a reference material in accordance with ISO-Guide 35 and the "Guide to the expression of uncertainty in measurement" by the Physikalisch-Technische Bundesanstalt, the national metrology institute of Germany.

CD-SEM real time bias correction using reference metrology based modeling

NASA Astrophysics Data System (ADS)

Ukraintsev, V.; Banke, W.; Zagorodnev, G.; Archie, C.; Rana, N.; Pavlovsky, V.; Smirnov, V.; Briginas, I.; Katnani, A.; Vaid, A.

2018-03-01

Accuracy of patterning impacts yield, IC performance and technology time to market. Accuracy of patterning relies on optical proximity correction (OPC) models built using CD-SEM inputs and intra die critical dimension (CD) control based on CD-SEM. Sub-nanometer measurement uncertainty (MU) of CD-SEM is required for current technologies. Reported design and process related bias variation of CD-SEM is in the range of several nanometers. Reference metrology and numerical modeling are used to correct SEM. Both methods are slow to be used for real time bias correction. We report on real time CD-SEM bias correction using empirical models based on reference metrology (RM) data. Significant amount of currently untapped information (sidewall angle, corner rounding, etc.) is obtainable from SEM waveforms. Using additional RM information provided for specific technology (design rules, materials, processes) CD extraction algorithms can be pre-built and then used in real time for accurate CD extraction from regular CD-SEM images. The art and challenge of SEM modeling is in finding robust correlation between SEM waveform features and bias of CD-SEM as well as in minimizing RM inputs needed to create accurate (within the design and process space) model. The new approach was applied to improve CD-SEM accuracy of 45 nm GATE and 32 nm MET1 OPC 1D models. In both cases MU of the state of the art CD-SEM has been improved by 3x and reduced to a nanometer level. Similar approach can be applied to 2D (end of line, contours, etc.) and 3D (sidewall angle, corner rounding, etc.) cases.

Towards absolute quantification of allergenic proteins in food--lysozyme in wine as a model system for metrologically traceable mass spectrometric methods and certified reference materials.

PubMed

Cryar, Adam; Pritchard, Caroline; Burkitt, William; Walker, Michael; O'Connor, Gavin; Burns, Duncan Thorburn; Quaglia, Milena

2013-01-01

Current routine food allergen quantification methods, which are based on immunochemistry, offer high sensitivity but can suffer from issues of specificity and significant variability of results. MS approaches have been developed, but currently lack metrological traceability. A feasibility study on the application of metrologically traceable MS-based reference procedures was undertaken. A proof of concept involving proteolytic digestion and isotope dilution MS for quantification of protein allergens in a food matrix was undertaken using lysozyme in wine as a model system. A concentration of lysozyme in wine of 0.95 +/- 0.03 microg/g was calculated based on the concentrations of two peptides, confirming that this type of analysis is viable at allergenically meaningful concentrations. The challenges associated with this promising method were explored; these included peptide stability, chemical modification, enzymatic digestion, and sample cleanup. The method is suitable for the production of allergen in food certified reference materials, which together with the achieved understanding of the effects of sample preparation and of the matrix on the final results, will assist in addressing the bias of the techniques routinely used and improve measurement confidence. Confirmation of the feasibility of MS methods for absolute quantification of an allergenic protein in a food matrix with results traceable to the International System of Units is a step towards meaningful comparison of results for allergen proteins among laboratories. This approach will also underpin risk assessment and risk management of allergens in the food industry, and regulatory compliance of the use of thresholds or action levels when adopted.

Common mode noise rejection properties of amplitude and phase noise in a heterodyne interferometer.

PubMed

Hechenblaikner, Gerald

2013-05-01

High precision metrology systems based on heterodyne interferometry can measure the position and attitude of objects to accuracies of picometer and nanorad, respectively. A frequently found feature of the general system design is the subtraction of a reference phase from the phase of the position interferometer, which suppresses low frequency common mode amplitude and phase fluctuations occurring in volatile optical path sections shared by both the position and reference interferometer. Spectral components of the noise at frequencies around or higher than the heterodyne frequency, however, are generally transmitted into the measurement band and may limit the measurement accuracy. Detailed analytical calculations complemented with Monte Carlo simulations show that high frequency noise components may also be entirely suppressed, depending on the relative difference of measurement and reference phase, which may be exploited by corresponding design provisions. While these results are applicable to any heterodyne interferometer with certain design characteristics, specific calculations and related discussions are given for the example of the optical metrology system of the LISA Pathfinder mission to space.

A 3D metrology system for the GMT

NASA Astrophysics Data System (ADS)

Rakich, A.; Dettmann, Lee; Leveque, S.; Guisard, S.

2016-08-01

The Giant Magellan Telescope (GMT)1 is a 25 m telescope composed of seven 8.4 m "unit telescopes", on a common mount. Each primary and conjugated secondary mirror segment will feed a common instrument interface, their focal planes co-aligned and co-phased. During telescope operation, the alignment of the optical components will deflect due to variations in thermal environment and gravity induced structural flexure of the mount. The ultimate co-alignment and co-phasing of the telescope is achieved by a combination of the Acquisition Guiding and Wavefront Sensing system and two segment edge-sensing systems2. An analysis of the capture range of the wavefront sensing system indicates that it is unlikely that that system will operate efficiently or reliably with initial mirror positions provided by open-loop corrections alone3. The project is developing a Telescope Metrology System (TMS) which incorporates a large number of absolute distance measuring interferometers. The system will align optical components of the telescope to the instrument interface to (well) within the capture range of the active optics wavefront sensing systems. The advantages offered by this technological approach to a TMS, over a network of laser trackers, are discussed. Initial investigations of the Etalon Absolute Multiline Technology™ by Etalon Ag4 show that a metrology network based on this product is capable of meeting requirements. A conceptual design of the system is presented and expected performance is discussed.

Ice flood velocity calculating approach based on single view metrology

NASA Astrophysics Data System (ADS)

Wu, X.; Xu, L.

2017-02-01

Yellow River is the river in which the ice flood occurs most frequently in China, hence, the Ice flood forecasting has great significance for the river flood prevention work. In various ice flood forecast models, the flow velocity is one of the most important parameters. In spite of the great significance of the flow velocity, its acquisition heavily relies on manual observation or deriving from empirical formula. In recent years, with the high development of video surveillance technology and wireless transmission network, the Yellow River Conservancy Commission set up the ice situation monitoring system, in which live videos can be transmitted to the monitoring center through 3G mobile networks. In this paper, an approach to get the ice velocity based on single view metrology and motion tracking technique using monitoring videos as input data is proposed. First of all, River way can be approximated as a plane. On this condition, we analyze the geometry relevance between the object side and the image side. Besides, we present the principle to measure length in object side from image. Secondly, we use LK optical flow which support pyramid data to track the ice in motion. Combining the result of camera calibration and single view metrology, we propose a flow to calculate the real velocity of ice flood. At last we realize a prototype system by programming and use it to test the reliability and rationality of the whole solution.

Laser SRS tracker for reverse prototyping tasks

NASA Astrophysics Data System (ADS)

Kolmakov, Egor; Redka, Dmitriy; Grishkanich, Aleksandr; Tsvetkov, Konstantin

2017-10-01

According to the current great interest concerning Large-Scale Metrology applications in many different fields of manufacturing industry, technologies and techniques for dimensional measurement have recently shown a substantial improvement. Ease-of-use, logistic and economic issues, as well as metrological performance, are assuming a more and more important role among system requirements. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of chip and microlasers as radiators on the linear-angular characteristics of existing measurement systems. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of microlasers as radiators on the linear-angular characteristics of existing measurement systems. The system consists of a distributed network-based layout, whose modularity allows to fit differently sized and shaped working volumes by adequately increasing the number of sensing units. Differently from existing spatially distributed metrological instruments, the remote sensor devices are intended to provide embedded data elaboration capabilities, in order to share the overall computational load.

Subaperture metrology technologies extend capabilities in optics manufacturing

NASA Astrophysics Data System (ADS)

Tricard, Marc; Forbes, Greg; Murphy, Paul

2005-10-01

Subaperture polishing technologies have radically changed the landscape of precision optics manufacturing and enabled the production of higher precision optics with increasingly difficult figure requirements. However, metrology is a critical piece of the optics fabrication process, and the dependence on interferometry is especially acute for computer-controlled, deterministic finishing. Without accurate full-aperture metrology, figure correction using subaperture polishing technologies would not be possible. QED Technologies has developed the Subaperture Stitching Interferometer (SSI) that extends the effective aperture and dynamic range of a phase measuring interferometer. The SSI's novel developments in software and hardware improve the capacity and accuracy of traditional interferometers, overcoming many of the limitations previously faced. The SSI performs high-accuracy automated measurements of spheres, flats, and mild aspheres up to 200 mm in diameter by stitching subaperture data. The system combines a six-axis precision workstation, a commercial Fizeau interferometer of 4" or 6" aperture, and dedicated software. QED's software automates the measurement design, data acquisition, and mathematical reconstruction of the full-aperture phase map. The stitching algorithm incorporates a general framework for compensating several types of errors introduced by the interferometer and stage mechanics. These include positioning errors, viewing system distortion, the system reference wave error, etc. The SSI has been proven to deliver the accurate and flexible metrology that is vital to precision optics fabrication. This paper will briefly review the capabilities of the SSI as a production-ready, metrology system that enables costeffective manufacturing of precision optical surfaces.

Fourier fringe analysis and its application to metrology of extreme physical phenomena: a review [Invited].

PubMed

Takeda, Mitsuo

2013-01-01

The paper reviews a technique for fringe analysis referred to as Fourier fringe analysis (FFA) or the Fourier transform method, with a particular focus on its application to metrology of extreme physical phenomena. Examples include the measurement of extremely small magnetic fields with subfluxon sensitivity by electron wave interferometry, subnanometer wavefront evaluation of projection optics for extreme UV lithography, the detection of sub-Ångstrom distortion of a crystal lattice, and the measurement of ultrashort optical pulses in the femotsecond to attosecond range, which show how the advantages of FFA are exploited in these cutting edge applications.

Comparison of the performance of the next generation of optical interferometers

NASA Astrophysics Data System (ADS)

Pisani, Marco; Yacoot, Andrew; Balling, Petr; Bancone, Nicola; Birlikseven, Cengiz; Çelik, Mehmet; Flügge, Jens; Hamid, Ramiz; Köchert, Paul; Kren, Petr; Kuetgens, Ulrich; Lassila, Antti; Bartolo Picotto, Gian; Şahin, Ersoy; Seppä, Jeremias; Tedaldi, Matthew; Weichert, Christoph

2012-08-01

Six European National Measurement Institutes (NMIs) have joined forces within the European Metrology Research Programme funded project NANOTRACE to develop the next generation of optical interferometers having a target uncertainty of 10 pm. These are needed for NMIs to provide improved traceable dimensional metrology that can be disseminated to the wider nanotechnology community, thereby supporting the growth in nanotechnology. Several approaches were followed in order to develop the interferometers. This paper briefly describes the different interferometers developed by the various partners and presents the results of a comparison of performance of the optical interferometers using an x-ray interferometer to generate traceable reference displacements.

A VLBI experiment using a remote atomic clock via a coherent fibre link

PubMed Central

Clivati, Cecilia; Ambrosini, Roberto; Artz, Thomas; Bertarini, Alessandra; Bortolotti, Claudio; Frittelli, Matteo; Levi, Filippo; Mura, Alberto; Maccaferri, Giuseppe; Nanni, Mauro; Negusini, Monia; Perini, Federico; Roma, Mauro; Stagni, Matteo; Zucco, Massimo; Calonico, Davide

2017-01-01

We describe a VLBI experiment in which, for the first time, the clock reference is delivered from a National Metrology Institute to a radio telescope using a coherent fibre link 550 km long. The experiment consisted of a 24-hours long geodetic campaign, performed by a network of European telescopes; in one of those (Medicina, Italy) the local clock was alternated with a signal generated from an optical comb slaved to a fibre-disseminated optical signal. The quality of the results obtained with this facility and with the local clock is similar: interferometric fringes were detected throughout the whole 24-hours period and it was possible to obtain a solution whose residuals are comparable to those obtained with the local clock. These results encourage further investigation of the ultimate VLBI performances achievable using fibre dissemination at the highest precision of state-of-the-art atomic clocks. PMID:28145451

A VLBI experiment using a remote atomic clock via a coherent fibre link.

PubMed

Clivati, Cecilia; Ambrosini, Roberto; Artz, Thomas; Bertarini, Alessandra; Bortolotti, Claudio; Frittelli, Matteo; Levi, Filippo; Mura, Alberto; Maccaferri, Giuseppe; Nanni, Mauro; Negusini, Monia; Perini, Federico; Roma, Mauro; Stagni, Matteo; Zucco, Massimo; Calonico, Davide

2017-02-01

We describe a VLBI experiment in which, for the first time, the clock reference is delivered from a National Metrology Institute to a radio telescope using a coherent fibre link 550 km long. The experiment consisted of a 24-hours long geodetic campaign, performed by a network of European telescopes; in one of those (Medicina, Italy) the local clock was alternated with a signal generated from an optical comb slaved to a fibre-disseminated optical signal. The quality of the results obtained with this facility and with the local clock is similar: interferometric fringes were detected throughout the whole 24-hours period and it was possible to obtain a solution whose residuals are comparable to those obtained with the local clock. These results encourage further investigation of the ultimate VLBI performances achievable using fibre dissemination at the highest precision of state-of-the-art atomic clocks.

A VLBI experiment using a remote atomic clock via a coherent fibre link

NASA Astrophysics Data System (ADS)

Clivati, Cecilia; Ambrosini, Roberto; Artz, Thomas; Bertarini, Alessandra; Bortolotti, Claudio; Frittelli, Matteo; Levi, Filippo; Mura, Alberto; Maccaferri, Giuseppe; Nanni, Mauro; Negusini, Monia; Perini, Federico; Roma, Mauro; Stagni, Matteo; Zucco, Massimo; Calonico, Davide

2017-02-01

We describe a VLBI experiment in which, for the first time, the clock reference is delivered from a National Metrology Institute to a radio telescope using a coherent fibre link 550 km long. The experiment consisted of a 24-hours long geodetic campaign, performed by a network of European telescopes; in one of those (Medicina, Italy) the local clock was alternated with a signal generated from an optical comb slaved to a fibre-disseminated optical signal. The quality of the results obtained with this facility and with the local clock is similar: interferometric fringes were detected throughout the whole 24-hours period and it was possible to obtain a solution whose residuals are comparable to those obtained with the local clock. These results encourage further investigation of the ultimate VLBI performances achievable using fibre dissemination at the highest precision of state-of-the-art atomic clocks.

EDITORIAL: Nanometrology Nanometrology

NASA Astrophysics Data System (ADS)

Tanaka, Mitsuru; Baba, Tetsuya; Postek, Michael T.

2011-02-01

Nanomanufacturing is an essential bridge between the discoveries of nanoscience and real-world nanotech products and is the vehicle by which the world will realize the promise of major technological innovation across a spectrum of products that will affect virtually every industrial sector. For micro and nanotech products to achieve the broad impacts envisioned, they must be manufactured in market-appropriate quantities in a reliable, repeatable, economical and commercially viable manner. In addition, they must be manufactured so that environmental and human health concerns are met, worker safety issues are appropriately assessed and handled, and liability issues are addressed. Critical to this realization of robust manufacturing at the nanoscale is the development of the necessary instrumentation, metrology and standards, i.e. nanometrology. The National Measurement Laboratories are committed to developing the required metrology. Integration of the instruments, their interoperability and appropriate information management are also critical elements that must be considered for viable micro and nanomanufacturing. Advanced instrumentation, metrology and standards will allow the physical dimensions, properties, functionality and purity of the materials, processes, tools, systems, products and emissions that will constitute micro and nanomanufacturing to be measured and characterized. This will in turn enable production to be scalable, controllable, predictable and repeatable to meet market needs. If a product cannot be measured it cannot be manufactured; if that product cannot be made safely it should not be manufactured, and finally, if the metrology is not in place how would you know? The articles in this special feature can be classified into three categories: dimensional metrology (8 papers and one technical design note), density of particles (2 papers) and metrology of thermal properties (3 papers). The articles on dimensional metrology include scanning probe microscope dimensional metrology, the through focus scanning optical (TSOM) imaging method, scatterfield optical microscopy, helium ion microscopy, metrology and combinations of these microscopy and imaging techniques applied to nanostructures and particles such as cellulose nanocrystals, and targeted liposome-based delivery systems. Dimensional metrology covers grating pitch measurement by optical diffraction, measurement of the thickness of silicon oxide by synchrotron radiation x-ray photoelectron spectroscopy (SR-XPS) analysis and determination of pore size distribution of porous low-dielectric-constant films by x-ray scattering. The two papers on particle density present number concentration standards for aerosol nanoparticles of larger diameter than about 10 nm and liquid-borne particles in the range of 10-20 µm diameter, respectively. The three papers on metrology of thermal properties present recent innovative progress in thermophysical metrology of thin films by the ultrafast laser flash methods required for understanding of the thermal science at nanoscales and thermal design of nanodevices. The first paper improves the technology applicable under high pressures in a diamond anvil cell. The second extends this technology to thin films on silicon substrates. The third reports the first observation of non-diffusive heat transfer across thin films at low temperatures. In order to guarantee reliability and traceability of developed measurement methods for nanomaterials, a technical infrastructure for nanomaterials such as metrological standards, reference materials and document standards for measurement methods is important. We hope this special feature will be the first step in a collaboration towards a global harmonization of nanometrology.

3D-profile measurement of advanced semiconductor features by using FIB as reference metrology

NASA Astrophysics Data System (ADS)

Takamasu, Kiyoshi; Iwaki, Yuuki; Takahashi, Satoru; Kawada, Hiroki; Ikota, Masami

2017-03-01

A novel method of sub-nanometer uncertainty for the 3D-profile measurement and LWR (Line Width Roughness) measurement by using FIB (Focused Ion Beam) processing, and TEM (Transmission Electron Microscope) and CD-SEM (Critical Dimension Scanning Electron Microscope) images measurement is proposed to standardize 3D-profile measurement through reference metrology. In this article, we apply the methodology to line profile measurements and roughness measurement of advanced FinFET (Fin-shaped Field-Effect Transistor) features. The FinFET features are horizontally sliced as a thin specimen by FIB micro sampling system. Horizontally images of the specimens are obtained then by a planar TEM. LWR is calculated from the edges positions on TEM images. Moreover, we already have demonstrated the novel on-wafer 3D-profile metrology as "FIB-to-CDSEM method" with FIB slope cut and CD-SEM measuring. Using the method, a few micrometers wide on a wafer is coated and cut by 45-degree slope using FIB tool. Then, the wafer is transferred to CD-SEM to measure the cross section image by top down CD-SEM measurement. We applied FIB-to-CDSEM method to a CMOS image sensor feature. The 45-degree slope cut surface is observed using AFM. The surface profile of slope cut surface and line profiles are analyzed for improving the accuracy of FIB-to-CDSEM method.

Optical Fiber Power Meter Comparison Between NIST and NIM.

PubMed

Vayshenker, I; Livigni, D J; Li, X; Lehman, J H; Li, J; Xiong, L M; Zhang, Z X

2010-01-01

We describe the results of a comparison of reference standards between the National Institute of Standards and Technology (NIST-USA) and National Institute of Metrology (NIM-China). We report optical fiber-based power measurements at nominal wavelengths of 1310 nm and 1550 nm. We compare the laboratories' reference standards by means of a commercial optical power meter. Measurement results showed the largest difference of less than 2.6 parts in 10(3), which is within the combined standard (k = 1) uncertainty for the laboratories' reference standards.

Calibration standards for major greenhouse gases and carbon monoxide: status and challenges.

NASA Astrophysics Data System (ADS)

Zellweger, Christoph; Mohn, Joachim; Wyss, Simon A.; Brewer, Paul; Mace, Tatiana; Nieuwenkamp, Gerard; Pearce-Hill, Ruth; Tarhan, Tanil; Walden, Jari; Emmenegger, Lukas

2017-04-01

Human influence on increasing greenhouse gas mole fractions in the atmosphere and effects on positive radiative forcing as well as observed global warming and sea level rise are well accepted [1]. For interpretation of global or continental scale greenhouse gas data, obtained from different laboratories, measurement results have to coincide within compatibility goals set by the World Meteorological Organization (WMO) [2]. Despite significant advances in measurement techniques [3], WMO compatibility goals are regularly missed, shown by round-robin experiments of standard gases and comparisons of field samples or parallel measurements. Therefore, precise and accurate calibration using standards with good long-term stability is needed to reduce uncertainties of atmospheric measurements. This is addressed by the WMO Global Atmosphere Watch Programme (GAW), where Central Calibration Laboratories (CCLs) maintain calibration scales to ensure consistency of measurements within the network to primary reference materials. Furthermore, participating GAW laboratories are supported by World Calibration Centres (WCCs) performing audits and organizing round-robin comparisons. The CCL participates regularly in comparisons with independent primary scales to assure traceability of established primary reference materials to fundamental quantities (SI) [e.g. 4]. Within the European Metrology Research Programme (EMRP) ENV52 project "Metrology for high-impact greenhouse gases" (HIGHGAS), static and dynamic primary reference gas mixtures for ambient levels of CO2, CH4, N2O and CO in air were prepared by different National Metrology Institutes (NMIs). In order to progress beyond the state of the art, research focused on improving passivation chemistry, quantification of target impurities in the air matrix, and determining the isotopic composition. These primary reference gas mixtures were compared in a round robin experiment against standards calibrated against reference gases currently used by the GAW community. We will show results of the comparison of the HIGHGAS and the WMO reference standards, and put this into the context of the WMO/GAW quality management framework. [1] IPCC, 2013: Climate Change 2013: The Physical Science Basis. Contribution of Working Group I to the Fifth Assessment Report of the Intergovernmental Panel on Climate Change [Stocker, T.F., D. Qin, G.-K. Plattner, M. Tignor, S.K. Allen, J. Boschung, A. Nauels, Y. Xia, V. Bex and P.M. Midgley (eds.)]. Cambridge University Press, Cambridge, United Kingdom and New York, NY, USA, 1535 pp. [2] WMO: 18th WMO/IAEA Meeting on Carbon Dioxide, Other Greenhouse Gases and Related Tracers Measurement Techniques (GGMT-2015), La Jolla, CA, USA, 13-17 September 2015, GAW Report No. 229, World Meteorological Organization, Geneva, Switzerland, 2016. [3] Zellweger, C., Emmenegger, L., Firdaus, M., Hatakka, J., Heimann, M., Kozlova, E., Spain, T. G., Steinbacher, M., van der Schoot, M. V., and Buchmann, B.: Assessment of recent advances in measurement techniques for atmospheric carbon dioxide and methane observations, Atmos. Meas. Tech., 9, 4737-4757, 2016. [4] Flores, E., Viallon, J., Choteau, T., Moussay, P., Wielgosz, R., Kang, N., Kim, B. M., Zalewska, E., van der Veen, A., Konopelko, L., Wu, H., Han, Q., Rhoderick, G., Guenther, F. R., Watanabe, T., Shimosaka, T., Kato, K., Hall, B., and Brewer, P.: International comparison CCQM-K82: methane in air at ambient level (1800 to 2200) nmol/mol, Metrologia, 52, 08001, 2015.

Data fusion for CD metrology: heterogeneous hybridization of scatterometry, CDSEM, and AFM data

NASA Astrophysics Data System (ADS)

Hazart, J.; Chesneau, N.; Evin, G.; Largent, A.; Derville, A.; Thérèse, R.; Bos, S.; Bouyssou, R.; Dezauzier, C.; Foucher, J.

2014-04-01

The manufacturing of next generation semiconductor devices forces metrology tool providers for an exceptional effort in order to meet the requirements for precision, accuracy and throughput stated in the ITRS. In the past years hybrid metrology (based on data fusion theories) has been investigated as a new methodology for advanced metrology [1][2][3]. This paper provides a new point of view of data fusion for metrology through some experiments and simulations. The techniques are presented concretely in terms of equations to be solved. The first point of view is High Level Fusion which is the use of simple numbers with their associated uncertainty postprocessed by tools. In this paper, it is divided into two stages: one for calibration to reach accuracy, the second to reach precision thanks to Bayesian Fusion. From our perspective, the first stage is mandatory before applying the second stage which is commonly presented [1]. However a reference metrology system is necessary for this fusion. So, precision can be improved if and only if the tools to be fused are perfectly matched at least for some parameters. We provide a methodology similar to a multidimensional TMU able to perform this matching exercise. It is demonstrated on a 28 nm node backend lithography case. The second point of view is Deep Level Fusion which works on the contrary with raw data and their combination. In the approach presented here, the analysis of each raw data is based on a parametric model and connections between the parameters of each tool. In order to allow OCD/SEM Deep Level Fusion, a SEM Compact Model derived from [4] has been developed and compared to AFM. As far as we know, this is the first time such techniques have been coupled at Deep Level. A numerical study on the case of a simple stack for lithography is performed. We show strict equivalence of Deep Level Fusion and High Level Fusion when tools are sensitive and models are perfect. When one of the tools can be considered as a reference and the second is biased, High Level Fusion is far superior to standard Deep Level Fusion. Otherwise, only the second stage of High Level Fusion is possible (Bayesian Fusion) and do not provide substantial advantage. Finally, when OCD is equipped with methods for bias detection [5], Deep Level Fusion outclasses the two-stage High Level Fusion and will benefit to the industry for most advanced nodes production.

Holistic metrology qualification extension and its application to characterize overlay targets with asymmetric effects

NASA Astrophysics Data System (ADS)

Dos Santos Ferreira, Olavio; Sadat Gousheh, Reza; Visser, Bart; Lie, Kenrick; Teuwen, Rachel; Izikson, Pavel; Grzela, Grzegorz; Mokaberi, Babak; Zhou, Steve; Smith, Justin; Husain, Danish; Mandoy, Ram S.; Olvera, Raul

2018-03-01

Ever increasing need for tighter on-product overlay (OPO), as well as enhanced accuracy in overlay metrology and methodology, is driving semiconductor industry's technologists to innovate new approaches to OPO measurements. In case of High Volume Manufacturing (HVM) fabs, it is often critical to strive for both accuracy and robustness. Robustness, in particular, can be challenging in metrology since overlay targets can be impacted by proximity of other structures next to the overlay target (asymmetric effects), as well as symmetric stack changes such as photoresist height variations. Both symmetric and asymmetric contributors have impact on robustness. Furthermore, tweaking or optimizing wafer processing parameters for maximum yield may have an adverse effect on physical target integrity. As a result, measuring and monitoring physical changes or process abnormalities/artefacts in terms of new Key Performance Indicators (KPIs) is crucial for the end goal of minimizing true in-die overlay of the integrated circuits (ICs). IC manufacturing fabs often relied on CD-SEM in the past to capture true in-die overlay. Due to destructive and intrusive nature of CD-SEMs on certain materials, it's desirable to characterize asymmetry effects for overlay targets via inline KPIs utilizing YieldStar (YS) metrology tools. These KPIs can also be integrated as part of (μDBO) target evaluation and selection for final recipe flow. In this publication, the Holistic Metrology Qualification (HMQ) flow was extended to account for process induced (asymmetric) effects such as Grating Imbalance (GI) and Bottom Grating Asymmetry (BGA). Local GI typically contributes to the intrafield OPO whereas BGA typically impacts the interfield OPO, predominantly at the wafer edge. Stack height variations highly impact overlay metrology accuracy, in particular in case of multi-layer LithoEtch Litho-Etch (LELE) overlay control scheme. Introducing a GI impact on overlay (in nm) KPI check quantifies the grating imbalance impact on overlay, whereas optimizing for accuracy using self-reference captures the bottom grating asymmetry effect. Measuring BGA after each process step before exposure of the top grating helps to identify which specific step introduces the asymmetry in the bottom grating. By evaluating this set of KPI's to a BEOL LELE overlay scheme, we can enhance robustness of recipe selection and target selection. Furthermore, these KPIs can be utilized to highlight process and equipment abnormalities. In this work, we also quantified OPO results with a self-contained methodology called Triangle Method. This method can be utilized for LELE layers with a common target and reference. This allows validating general μDBO accuracy, hence reducing the need for CD-SEM verification.

Writing next-generation display photomasks

NASA Astrophysics Data System (ADS)

Sandstrom, Tor; Wahlsten, Mikael; Park, Youngjin

2016-10-01

Recent years have seen a fast technical development within the display area. Displays get ever higher pixel density and the pixels get smaller. Current displays have over 800 PPI and market forces will eventually drive for densities of 2000 PPI or higher. The transistor backplanes also get more complex. OLED displays require 4-7 transistors per pixel instead of the typical 1-2 transistors used for LCDs, and they are significantly more sensitive to errors. New large-area maskwriters have been developed for masks used in high volume production of screens for state-of-theart smartphones. Redesigned laser optics with higher NA and lower aberrations improve resolution and CD uniformity and reduce mura effects. The number of beams has been increased to maintain the throughput despite the higher writing resolution. OLED displays are highly sensitive to placement errors and registration in the writers has been improved. To verify the registration of produced masks a separate metrology system has been developed. The metrology system is self-calibrated to high accuracy. The calibration is repeatable across machines and sites using Z-correction. The repeatability of the coordinate system makes it possible to standardize the coordinate system across an entire supply chain or indeed across the entire industry. In-house metrology is a commercial necessity for high-end mask shop, but also the users of the masks, the panel makers, would benefit from having in-house metrology. It would act as the reference for their mask suppliers, give better predictive and post mortem diagnostic power for the panel process, and the metrology could be used to characterize and improve the entire production loop from data to panel.

web-based interactive data processing: application to stable isotope metrology.

PubMed

Verkouteren, R M; Lee, J N

2001-08-01

To address a fundamental need in stable isotope metrology, the National Institute of Standards and Technology (NIST) has established a web-based interactive data-processing system accessible through a common gateway interface (CGI) program on the internet site http://www. nist.gov/widps-co2. This is the first application of a web-based tool that improves the measurement traceability afforded by a series of NIST standard materials. Specifically, this tool promotes the proper usage of isotope reference materials (RMs) and improves the quality of reported data from extensive measurement networks. Through the International Atomic Energy Agency (IAEA), we have defined standard procedures for stable isotope measurement and data-processing, and have determined and applied consistent reference values for selected NIST and IAEA isotope RMs. Measurement data of samples and RMs are entered into specified fields on the web-based form. These data are submitted through the CGI program on a NIST Web server, where appropriate calculations are performed and results returned to the client. Several international laboratories have independently verified the accuracy of the procedures and algorithm for measurements of naturally occurring carbon-13 and oxygen-18 abundances and slightly enriched compositions up to approximately 150% relative to natural abundances. To conserve the use of the NIST RMs, users may determine value assignments for a secondary standard to be used in routine analysis. Users may also wish to validate proprietary algorithms embedded in their laboratory instrumentation, or specify the values of fundamental variables that are usually fixed in reduction algorithms to see the effect on the calculations. The results returned from the web-based tool are limited in quality only by the measurements themselves, and further value may be realized through the normalization function. When combined with stringent measurement protocols, two- to threefold improvements have been realized in the reproducibility of carbon-13 and oxygen-18 determinations across laboratories.

Digital Phase Meter for a Laser Heterodyne Interferometer

NASA Technical Reports Server (NTRS)

Loya, Frank

2008-01-01

The Digital Phase Meter is based on a modified phase-locked loop. When phase alignment between the reference input and the phase-shifted metrological input is achieved, the loop locks and the phase shift of the digital phase shifter equals the phase difference that one seeks to measure. This digital phase meter is being developed for incorporation into a laser heterodyne interferometer in a metrological apparatus, but could also be adapted to other uses. Relative to prior phase meters of similar capability, including digital ones, this digital phase meter is smaller, less complex, and less expensive. The phase meter has been constructed and tested in the form of a field-programmable gate array (FPGA).

Applications of Microwave Photonics in Radio Astronomy and Space Communication

NASA Technical Reports Server (NTRS)

D'Addario, Larry R.; Shillue, William P.

2006-01-01

An overview of narrow band vs wide band signals is given. Topics discussed included signal transmission, reference distribution and photonic antenna metrology. Examples of VLA, ALMA, ATA and DSN arrays are given. . Arrays of small antennas have become more cost-effective than large antennas for achieving large total aperture or gain, both for astronomy and for communication. It is concluded that emerging applications involving arrays of many antennas require low-cost optical communication of both wide bandwidth and narrow bandwidth; development of round-trip correction schemes enables timing precision; and free-space laser beams with microwave modulation allow structural metrology with approx 100 micrometer precision over distances of 200 meters.

Measurement uncertainty: Friend or foe?

PubMed

Infusino, Ilenia; Panteghini, Mauro

2018-02-02

The definition and enforcement of a reference measurement system, based on the implementation of metrological traceability of patients' results to higher order reference methods and materials, together with a clinically acceptable level of measurement uncertainty, are fundamental requirements to produce accurate and equivalent laboratory results. The uncertainty associated with each step of the traceability chain should be governed to obtain a final combined uncertainty on clinical samples fulfilling the requested performance specifications. It is important that end-users (i.e., clinical laboratory) may know and verify how in vitro diagnostics (IVD) manufacturers have implemented the traceability of their calibrators and estimated the corresponding uncertainty. However, full information about traceability and combined uncertainty of calibrators is currently very difficult to obtain. Laboratory professionals should investigate the need to reduce the uncertainty of the higher order metrological references and/or to increase the precision of commercial measuring systems. Accordingly, the measurement uncertainty should not be considered a parameter to be calculated by clinical laboratories just to fulfil the accreditation standards, but it must become a key quality indicator to describe both the performance of an IVD measuring system and the laboratory itself. Copyright © 2018 The Canadian Society of Clinical Chemists. Published by Elsevier Inc. All rights reserved.

Speed scanning system based on solid-state microchip laser for architectural planning

NASA Astrophysics Data System (ADS)

Redka, Dmitriy; Grishkanich, Alexsandr S.; Kolmakov, Egor; Tsvetkov, Konstantin

2017-10-01

According to the current great interest concerning Large-Scale Metrology applications in many different fields of manufacturing industry, technologies and techniques for dimensional measurement have recently shown a substantial improvement. Ease-of-use, logistic and economic issues, as well as metrological performance, are assuming a more and more important role among system requirements. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of microlasers as radiators on the linear-angular characteristics of existing measurement systems. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of microlasers as radiators on the linear-angular characteristics of existing measurement systems. The system consists of a distributed network-based layout, whose modularity allows to fit differently sized and shaped working volumes by adequately increasing the number of sensing units. Differently from existing spatially distributed metrological instruments, the remote sensor devices are intended to provide embedded data elaboration capabilities, in order to share the overall computational load.

Coordinate measuring system based on microchip lasers for reverse prototyping

NASA Astrophysics Data System (ADS)

Iakovlev, Alexey; Grishkanich, Alexsandr S.; Redka, Dmitriy; Tsvetkov, Konstantin

2017-02-01

According to the current great interest concerning Large-Scale Metrology applications in many different fields of manufacturing industry, technologies and techniques for dimensional measurement have recently shown a substantial improvement. Ease-of-use, logistic and economic issues, as well as metrological performance, are assuming a more and more important role among system requirements. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of chip and microlasers as radiators on the linear-angular characteristics of existing measurement systems. The project is planned to conduct experimental studies aimed at identifying the impact of the application of the basic laws of microlasers as radiators on the linear-angular characteristics of existing measurement systems. The system consists of a distributed network-based layout, whose modularity allows to fit differently sized and shaped working volumes by adequately increasing the number of sensing units. Differently from existing spatially distributed metrological instruments, the remote sensor devices are intended to provide embedded data elaboration capabilities, in order to share the overall computational load.

Hologram repositioning by an interferometric technique.

PubMed

Soares, O D

1979-11-15

An interferometric technique for hologram repositioning is described where the hologram is compared with the interference pattern of the reference and object waves. Analytical expressions to evaluate the accuracy of the repositioning are presented for the method. Two applications of the method in metrology for micromovement measurements are proposed.

Correlation methods in optical metrology with state-of-the-art x-ray mirrors

NASA Astrophysics Data System (ADS)

Yashchuk, Valeriy V.; Centers, Gary; Gevorkyan, Gevork S.; Lacey, Ian; Smith, Brian V.

2018-01-01

The development of fully coherent free electron lasers and diffraction limited storage ring x-ray sources has brought to focus the need for higher performing x-ray optics with unprecedented tolerances for surface slope and height errors and roughness. For example, the proposed beamlines for the future upgraded Advance Light Source, ALS-U, require optical elements characterized by a residual slope error of <100 nrad (root-mean-square) and height error of <1-2 nm (peak-tovalley). These are for optics with a length of up to one meter. However, the current performance of x-ray optical fabrication and metrology generally falls short of these requirements. The major limitation comes from the lack of reliable and efficient surface metrology with required accuracy and with reasonably high measurement rate, suitable for integration into the modern deterministic surface figuring processes. The major problems of current surface metrology relate to the inherent instrumental temporal drifts, systematic errors, and/or an unacceptably high cost, as in the case of interferometry with computer-generated holograms as a reference. In this paper, we discuss the experimental methods and approaches based on correlation analysis to the acquisition and processing of metrology data developed at the ALS X-Ray Optical Laboratory (XROL). Using an example of surface topography measurements of a state-of-the-art x-ray mirror performed at the XROL, we demonstrate the efficiency of combining the developed experimental correlation methods to the advanced optimal scanning strategy (AOSS) technique. This allows a significant improvement in the accuracy and capacity of the measurements via suppression of the instrumental low frequency noise, temporal drift, and systematic error in a single measurement run. Practically speaking, implementation of the AOSS technique leads to an increase of the measurement accuracy, as well as the capacity of ex situ metrology by a factor of about four. The developed method is general and applicable to a broad spectrum of high accuracy measurements.

Automatic three-dimensional measurement of large-scale structure based on vision metrology.

PubMed

Zhu, Zhaokun; Guan, Banglei; Zhang, Xiaohu; Li, Daokui; Yu, Qifeng

2014-01-01

All relevant key techniques involved in photogrammetric vision metrology for fully automatic 3D measurement of large-scale structure are studied. A new kind of coded target consisting of circular retroreflective discs is designed, and corresponding detection and recognition algorithms based on blob detection and clustering are presented. Then a three-stage strategy starting with view clustering is proposed to achieve automatic network orientation. As for matching of noncoded targets, the concept of matching path is proposed, and matches for each noncoded target are found by determination of the optimal matching path, based on a novel voting strategy, among all possible ones. Experiments on a fixed keel of airship have been conducted to verify the effectiveness and measuring accuracy of the proposed methods.

Adhesive Bonding for Optical Metrology Systems in Space Applications

NASA Astrophysics Data System (ADS)

Gohlke, Martin; Schuldt, Thilo; Döringshoff, Klaus; Peters, Achim; Johann, Ulrich; Weise, Dennis; Braxmaier, Claus

2015-05-01

Laser based metrology systems become more and more attractive for space applications and are the core elements of planned missions such as LISA (NGO, eLISA) or NGGM where laser interferometry is used for distance measurements between satellites. The GRACE-FO mission will for the first time demonstrate a Laser Ranging Instrument (LRI) in space, starting 2017. Laser based metrology also includes optical clocks/references, either as ultra-stable light source for high sensitivity interferometry or as scientific payload e.g. proposed in fundamental physics missions such as mSTAR (mini SpaceTime Asymmetry Research), a mission dedicated to perform a Kennedy-Thorndike experiment on a satellite in a low-Earth orbit. To enable the use of existing optical laboratory setups, optimization with respect to power consumption, weight and dimensions is necessary. At the same time the thermal and structural stability must be increased. Over the last few years we investigated adhesive bonding of optical components to thermally highly stable glass ceramics as an easy-to-handle assembly integration technology. Several setups were implemented and tested for potential later use in space applications. We realized a heterodyne LISA related interferometer with demonstrated noise levels in the pm-range for translation measurement and nano-radiant-range for tilt measurements and two iodine frequency references on Elegant Breadboard (EBB) and Engineering Model (EM) level with frequency stabilities in the 10-15 range for longer integration times. The EM setup was thermally cycled and vibration tested.

Industrial Photogrammetry - Accepted Metrology Tool or Exotic Niche

NASA Astrophysics Data System (ADS)

Bösemann, Werner

2016-06-01

New production technologies like 3D printing and other adaptive manufacturing technologies have changed the industrial manufacturing process, often referred to as next industrial revolution or short industry 4.0. Such Cyber Physical Production Systems combine virtual and real world through digitization, model building process simulation and optimization. It is commonly understood that measurement technologies are the key to combine the real and virtual worlds (eg. [Schmitt 2014]). This change from measurement as a quality control tool to a fully integrated step in the production process has also changed the requirements for 3D metrology solutions. Key words like MAA (Measurement Assisted Assembly) illustrate that new position of metrology in the industrial production process. At the same time it is obvious that these processes not only require more measurements but also systems to deliver the required information in high density in a short time. Here optical solutions including photogrammetry for 3D measurements have big advantages over traditional mechanical CMM's. The paper describes the relevance of different photogrammetric solutions including state of the art, industry requirements and application examples.

Metrological approaches to organic chemical purity: primary reference materials for vitamin D metabolites.

PubMed

Nelson, Michael A; Bedner, Mary; Lang, Brian E; Toman, Blaza; Lippa, Katrice A

2015-11-01

Given the critical role of pure, organic compound primary reference standards used to characterize and certify chemical Certified Reference Materials (CRMs), it is essential that associated mass purity assessments be fit-for-purpose, represented by an appropriate uncertainty interval, and metrologically sound. The mass fraction purities (% g/g) of 25-hydroxyvitamin D (25(OH)D) reference standards used to produce and certify values for clinical vitamin D metabolite CRMs were investigated by multiple orthogonal quantitative measurement techniques. Quantitative (1)H-nuclear magnetic resonance spectroscopy (qNMR) was performed to establish traceability of these materials to the International System of Units (SI) and to directly assess the principal analyte species. The 25(OH)D standards contained volatile and water impurities, as well as structurally-related impurities that are difficult to observe by chromatographic methods or to distinguish from the principal 25(OH)D species by one-dimensional NMR. These impurities have the potential to introduce significant biases to purity investigations in which a limited number of measurands are quantified. Combining complementary information from multiple analytical methods, using both direct and indirect measurement techniques, enabled mitigation of these biases. Purities of 25(OH)D reference standards and associated uncertainties were determined using frequentist and Bayesian statistical models to combine data acquired via qNMR, liquid chromatography with UV absorbance and atmospheric pressure-chemical ionization mass spectrometric detection (LC-UV, LC-ACPI-MS), thermogravimetric analysis (TGA), and Karl Fischer (KF) titration.

TWSTFT Network Status in the Pacific Rim Region and Development of a New Time Transfer Modem for TWSTFT

DTIC Science & Technology

2000-01-01

32nd Annual Precise T ime and Time Interval ( P T T I ) Meeting TWSTFT NETWORK STATUS IN THE PACIFIC RIM REGION AND DEVELOPMENT OF A NEW TIME...TRANSFER MODEM FOR TWSTFT M. Imael, M. Hosokawal, Y . Hanadol, 2. Li2, P. Fisk3, Y . Nakadan4, and C. S. Liao5 ’Communications Research Laboratory...Metrology (NRLM), Japan 5Telecommunication Laboratories (TL) , Taipei, Taiwan Abstract Iko-Way Satellite Time and Frequency Transfer ( TWSTFT ) is one

Survey of Industrial, Agricultural, and Medical Applications of Radiometric Gauging and Process Control

PubMed Central

Hubbell, J. H.

1990-01-01

Photon and particle radiations (gamma rays, x rays, brems-strahlung, electrons and other charged particles, and neutrons) from radioactive isotopes, x-ray tubes, and accelerators are now widely used in gauging, production control, and other monitoring and metrology devices where avoidance of mechanical contact is desirable. The general principles of radiation gauges, which rely on detection of radiation transmitted by the sample, or on detection of scattered or other secondary radiations produced in the sample, are discussed. Examples of such devices currently used or at least shown to be feasible in industrial, transportation, building, mining, agricultural, medical, and other metrology situations are presented, drawing from a total of 146 selected technical and review paper reference sources here cited. PMID:28179800

The radiation metrology network related to the field of mammography: implementation and uncertainty analysis of the calibration system

NASA Astrophysics Data System (ADS)

Peixoto, J. G. P.; de Almeida, C. E.

2001-09-01

It is recognized by the international guidelines that it is necessary to offer calibration services for mammography beams in order to improve the quality of clinical diagnosis. Major efforts have been made by several laboratories in order to establish an appropriate and traceable calibration infrastructure and to provide the basis for a quality control programme in mammography. The contribution of the radiation metrology network to the users of mammography is reviewed in this work. Also steps required for the implementation of a mammography calibration system using a constant potential x-ray and a clinical mammography x-ray machine are presented. The various qualities of mammography radiation discussed in this work are in accordance with the IEC 61674 and the AAPM recommendations. They are at present available at several primary standard dosimetry laboratories (PSDLs), namely the PTB, NIST and BEV and a few secondary standard dosimetry laboratories (SSDLs) such as at the University of Wisconsin and at the IAEA's SSDL. We discuss the uncertainties involved in all steps of the calibration chain in accord with the ISO recommendations.

A highly accurate absolute gravimetric network for Albania, Kosovo and Montenegro

NASA Astrophysics Data System (ADS)

Ullrich, Christian; Ruess, Diethard; Butta, Hubert; Qirko, Kristaq; Pavicevic, Bozidar; Murat, Meha

2016-04-01

The objective of this project is to establish a basic gravity network in Albania, Kosovo and Montenegro to enable further investigations in geodetic and geophysical issues. Therefore the first time in history absolute gravity measurements were performed in these countries. The Norwegian mapping authority Kartverket is assisting the national mapping authorities in Kosovo (KCA) (Kosovo Cadastral Agency - Agjencia Kadastrale e Kosovës), Albania (ASIG) (Autoriteti Shtetëror i Informacionit Gjeohapësinor) and in Montenegro (REA) (Real Estate Administration of Montenegro - Uprava za nekretnine Crne Gore) in improving the geodetic frameworks. The gravity measurements are funded by Kartverket. The absolute gravimetric measurements were performed from BEV (Federal Office of Metrology and Surveying) with the absolute gravimeter FG5-242. As a national metrology institute (NMI) the Metrology Service of the BEV maintains the national standards for the realisation of the legal units of measurement and ensures their international equivalence and recognition. Laser and clock of the absolute gravimeter were calibrated before and after the measurements. The absolute gravimetric survey was carried out from September to October 2015. Finally all 8 scheduled stations were successfully measured: there are three stations located in Montenegro, two stations in Kosovo and three stations in Albania. The stations are distributed over the countries to establish a gravity network for each country. The vertical gradients were measured at all 8 stations with the relative gravimeter Scintrex CG5. The high class quality of some absolute gravity stations can be used for gravity monitoring activities in future. The measurement uncertainties of the absolute gravity measurements range around 2.5 micro Gal at all stations (1 microgal = 10-8 m/s2). In Montenegro the large gravity difference of 200 MilliGal between station Zabljak and Podgorica can be even used for calibration of relative gravimeters. The complete basic gravimetric network of these countries will be tied to these absolute stations. In this presentation all the stations and results will be presented in detail and some special results analysed.

CONFERENCE NOTE: CETO—Centro de Ciências e Tecnologias Opticas, Trends in Optical Fibre Metrology and Standards

NASA Astrophysics Data System (ADS)

1994-01-01

Summer School, 27 June to 8 July 1994, Viana do Castelo, Hotel do Parque, Portugal Optical fibres, with their extremely low transmission loss, untapped bandwidth and controllable dispersion, dominate a broad range of technologies in which applications must respond to the increasing constraints of today's specifications as well as envisage future requirements. Optical fibres dominate communications systems. In the area of sensors, fibre optics will be fully exploited for their immunity to EMI, their high sensitivity and their large dynamic range. The maturity of single mode optical technology has led to intensive R&D of a range of components based on the advantages of transmission characteristics and signal processing. Specifications and intercompatibility requests for the new generation of both analogue and digital fibre optical components and systems has created a demand for sophisticated measuring techniques based on unique and complex instruments. In recent years there has been a signification evolution in response to the explosion of applications and the tightening of specifications. These developments justify a concerted effort to focus on trends in optical fibre metrology and standards. Objective The objective of this school is to provide a progressive and comprehensive presentation of current issues concerning passive and active optical fibre characterization and measurement techniques. Passive fibre components support a variety of developments in optical fibre systems and will be discussed in terms of relevance and standards. Particular attention will be paid to devices for metrological purposes such as reference fibres and calibration artefacts. The characterization and testing of optical fibre amplifiers, which have great potential in telecommunications, data distribution networks and as a system part in instrumentation, will be covered. Methods of measurement and means of calibration with traceability will be discussed, together with the characterization requirements of the new generation of analogue and digital fibre optical systems, which require sophisticated measurement techniques employing complex instruments unique to optical measurements. The school will foster and enhance the interaction between material, devices, systems, and standards-oriented R&D communities, as well as between engineers concerned with design and manufacturers of systems and instrumentation. Topics Review of optical fibre communication technology and systems Measurement techniques for fibre characterization: Reliability and traceability Reference fibres and calibration artefacts Ribbon fibres Mechanical and environmental testing Fibre reliability Polarimetric measurements Passive components characterization: Splices and connectors Couplers, splitters, taps and WDMs Optical fibres and isolators WDM technologies and applications: WDM technologies Tunable optical filters Fibre amplifiers and sources: Performances and characterization Design and standards Nonlinear effects Subsystem design and standards: Design and fabrication techniques Performance degradation and reliability Evaluation of costs/performance/technology Sensors IR - optical fibres Plastic fibres Instrumentation Registration Participation free of charge for postgraduate students, with some grants available for travel and lodging expenses. All correspondence should be addressed to: Secretariat, Trends in Optical Fibre Metrology and Standards, a/c Prof. Olivério D D Soares, Centro de Ciências e Tecnologias Opticas, Lab. Fisica - Faculdade de Ciências, Praça Gomes Teixeira, P-4000 Porto, Portugal. Tel: 351-2-310290, 351-2-2001648; Fax: 351-2-319267.

Improving automated 3D reconstruction methods via vision metrology

NASA Astrophysics Data System (ADS)

Toschi, Isabella; Nocerino, Erica; Hess, Mona; Menna, Fabio; Sargeant, Ben; MacDonald, Lindsay; Remondino, Fabio; Robson, Stuart

2015-05-01

This paper aims to provide a procedure for improving automated 3D reconstruction methods via vision metrology. The 3D reconstruction problem is generally addressed using two different approaches. On the one hand, vision metrology (VM) systems try to accurately derive 3D coordinates of few sparse object points for industrial measurement and inspection applications; on the other, recent dense image matching (DIM) algorithms are designed to produce dense point clouds for surface representations and analyses. This paper strives to demonstrate a step towards narrowing the gap between traditional VM and DIM approaches. Efforts are therefore intended to (i) test the metric performance of the automated photogrammetric 3D reconstruction procedure, (ii) enhance the accuracy of the final results and (iii) obtain statistical indicators of the quality achieved in the orientation step. VM tools are exploited to integrate their main functionalities (centroid measurement, photogrammetric network adjustment, precision assessment, etc.) into the pipeline of 3D dense reconstruction. Finally, geometric analyses and accuracy evaluations are performed on the raw output of the matching (i.e. the point clouds) by adopting a metrological approach. The latter is based on the use of known geometric shapes and quality parameters derived from VDI/VDE guidelines. Tests are carried out by imaging the calibrated Portable Metric Test Object, designed and built at University College London (UCL), UK. It allows assessment of the performance of the image orientation and matching procedures within a typical industrial scenario, characterised by poor texture and known 3D/2D shapes.

Official USP Reference Standards: metrology concepts, overview, and scientific issues and opportunities.

PubMed

Williams, Roger L

2006-01-23

The United States Pharmacopeia (USP) is a private standards-setting body created in 1820 by practitioners who wished to promote the quality of therapeutic products in commerce. The principal product of USP, then and now, is the United StatesPharmacopeia (USP), to which was added the National Formulary (NF) in 1975. The two compendia are published as a combined text annually (USP-NF). Originally a book of process standards, USP-NF evolved over time into compendia containing primarily product standards that are expressed in monographs for therapeutic ingredients, products, and excipients. As a public health service, USP supplies official USP Reference Standards to manufacturers and others who wish to test an article according to selected procedures of a monograph or General Chapter. During the past decade, understanding of USP monographs and official USP Reference Standards as a means of controlling the quality of a therapeutic article has evolved, based on advances in metrology, on activities in the International Conference on Harmonization of Technical Requirements for the Registration of Pharmaceuticals for Human Use (ICH), and on considerations by the USP Council of Experts and its Expert Committees and USP staff. This article discusses the evolution of this understanding, focusing on drug substances and excipients for well-characterized small molecules and their corresponding dosage forms.

Evolution of Timescales from Astronomy to Physical Metrology

DTIC Science & Technology

2011-07-20

2000 [7] recommended the use of the ‘non-rotating origin’ both in the Geocentric Celestial Reference System (GCRS) and the International Terrestrial...timescale defined in a geocentric reference frame with the SI second as realized on the rotating geoid as the scale unit’ [30, 31]. This meant that it was...of the new timescale for apparent geocentric ephemerides, will be 1977 January 1d.0003725 (1d 00h 00m 32.184s) exactly. (b) The unit of this timescale

First report on a European round robin for slope measuring profilers

NASA Astrophysics Data System (ADS)

Rommeveaux, Amparo; Thomasset, Muriel; Cocco, Daniele; Siewert, Frank

2005-08-01

In the framework of the European COoperation in the field of Scientific and Technical research action on "X-ray and Neutron Optic" (COST P7) and following the decision announced in the last International Workshop on Metrology for X-ray and neutron optic (Grenoble, April 2004), the metrology facilities of four European synchrotrons, Bessy, Elettra, ESRF and Soleil, have decided and started a program of instrument inter-comparison. Other synchrotrons are joining us and further interested Institutions are invited to participate in this open measurement comparison. The metrology instruments involved are different kinds of direct slope measurement devices, like the well known Long Trace Profiler (in house made or modified) and the Bessy N.O.M.. The Round Robin was started with 2 flat and 2 spherical mirrors (three made of Zerodur and one of fused silica) made available by Bessy and Elettra. A short radius of curvature spherical mirror of Silicon from SOLEIL was later added. First results show a very close match between the measurements of all facilities provided that the same procedures are followed. In particular, a special attention has to be given to the way of supporting the reference objects, as it will be illustrated by some examples. Another important issue is the characterization of the systematic errors of the different instruments and how they can be reduced or eliminated. The paper expects to open a discussion on the performances of different commercial and custom made or modified profilometers, and over standard procedures for calibration testing, including the definition of standard reference surfaces.

Applications of surface metrology in firearm identification

NASA Astrophysics Data System (ADS)

Zheng, X.; Soons, J.; Vorburger, T. V.; Song, J.; Renegar, T.; Thompson, R.

2014-01-01

Surface metrology is commonly used to characterize functional engineering surfaces. The technologies developed offer opportunities to improve forensic toolmark identification. Toolmarks are created when a hard surface, the tool, comes into contact with a softer surface and causes plastic deformation. Toolmarks are commonly found on fired bullets and cartridge cases. Trained firearms examiners use these toolmarks to link an evidence bullet or cartridge case to a specific firearm, which can lead to a criminal conviction. Currently, identification is typically based on qualitative visual comparison by a trained examiner using a comparison microscope. In 2009, a report by the National Academies called this method into question. Amongst other issues, they questioned the objectivity of visual toolmark identification by firearms examiners. The National Academies recommended the development of objective toolmark identification criteria and confidence limits. The National Institute of Standards and Technology (NIST) have applied its experience in surface metrology to develop objective identification criteria, measurement methods, and reference artefacts for toolmark identification. NIST developed the Standard Reference Material SRM 2460 standard bullet and SRM 2461 standard cartridge case to facilitate quality control and traceability of identifications performed in crime laboratories. Objectivity is improved through measurement of surface topography and application of unambiguous surface similarity metrics, such as the maximum value (ACCFMAX) of the areal cross correlation function. Case studies were performed on consecutively manufactured tools, such as gun barrels and breech faces, to demonstrate that, even in this worst case scenario, all the tested tools imparted unique surface topographies that were identifiable. These studies provide scientific support for toolmark evidence admissibility in criminal court cases.

Final report on key comparison APMP.M.P-K13 in hydraulic gauge pressure from 50 MPa to 500 MPa

NASA Astrophysics Data System (ADS)

Kajikawa, Hiroaki; Kobata, Tokihiko; Yadav, Sanjay; Jian, Wu; Changpan, Tawat; Owen, Neville; Yanhua, Li; Hung, Chen-Chuan; Ginanjar, Gigin; Choi, In-Mook

2015-01-01

This report describes the results of a key comparison of hydraulic high-pressure standards at nine National Metrology Institutes (NMIs: NMIJ/AIST, NPLI, NMC/A*STAR, NIMT, NMIA, NIM, CMS/ITRI, KIM-LIPI, and KRISS) within the framework of the Asia-Pacific Metrology Programme (APMP) in order to determine their degrees of equivalence in the pressure range from 50 MPa to 500 MPa in gauge mode. The pilot institute was the National Metrology Institute of Japan (NMIJ/AIST). All participating institutes used hydraulic pressure balances as their pressure standards. A set of pressure balance with a free-deformational piston-cylinder assembly was used as the transfer standard. Three piston-cylinder assemblies, only one at a time, were used to complete the measurements in the period from November 2010 to January 2013. Ten participants completed their measurements and reported the pressure-dependent effective areas of the transfer standard at specified pressures with the associated uncertainties. Since one of the participants withdrew its results, the measurement results of the nine participants were finally compared. The results were linked to the CCM.P-K13 reference values through the results of two linking laboratories, NMIJ/AIST and NPLI. The degrees of equivalence were evaluated by the relative deviations of the participants' results from the CCM.P-K13 key comparison reference values, and their associated combined expanded (k=2) uncertainties. The results of all the nine participating NMIs agree with the CCM.P-K13 reference values within their expanded (k=2) uncertainties in the entire pressure range from 50 MPa to 500 MPa. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by CCM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Metrology for stable isotope reference materials: 13C/12C and 18O/16O isotope ratio value assignment of pure carbon dioxide gas samples on the Vienna PeeDee Belemnite-CO2 scale using dual-inlet mass spectrometry.

PubMed

Srivastava, Abneesh; Michael Verkouteren, R

2018-07-01

Isotope ratio measurements have been conducted on a series of isotopically distinct pure CO 2 gas samples using the technique of dual-inlet isotope ratio mass spectrometry (DI-IRMS). The influence of instrumental parameters, data normalization schemes on the metrological traceability and uncertainty of the sample isotope composition have been characterized. Traceability to the Vienna PeeDee Belemnite(VPDB)-CO 2 scale was realized using the pure CO 2 isotope reference materials(IRMs) 8562, 8563, and 8564. The uncertainty analyses include contributions associated with the values of iRMs and the repeatability and reproducibility of our measurements. Our DI-IRMS measurement system is demonstrated to have high long-term stability, approaching a precision of 0.001 parts-per-thousand for the 45/44 and 46/44 ion signal ratios. The single- and two-point normalization bias for the iRMs were found to be within their published standard uncertainty values. The values of 13 C/ 12 C and 18 O/ 16 O isotope ratios are expressed relative to VPDB-CO 2 using the [Formula: see text] and [Formula: see text] notation, respectively, in parts-per-thousand (‰ or per mil). For the samples, value assignments between (-25 to +2) ‰ and (-33 to -1) ‰ with nominal combined standard uncertainties of (0.05, 0.3) ‰ for [Formula: see text] and [Formula: see text], respectively were obtained. These samples are used as laboratory reference to provide anchor points for value assignment of isotope ratios (with VPDB traceability) to pure CO 2 samples. Additionally, they serve as potential parent isotopic source material required for the development of gravimetric based iRMs of CO 2 in CO 2 -free dry air in high pressure gas cylinder packages at desired abundance levels and isotopic composition values. Graphical abstract CO 2 gas isotope ratio metrology.

Quantum cascade laser-based mid-IR frequency metrology system with ultra-narrow linewidth and 1  ×  10⁻¹³-level frequency instability.

PubMed

Hansen, Michael G; Magoulakis, Evangelos; Chen, Qun-Feng; Ernsting, Ingo; Schiller, Stephan

2015-05-15

We demonstrate a powerful tool for high-resolution mid-IR spectroscopy and frequency metrology with quantum cascade lasers (QCLs). We have implemented frequency stabilization of a QCL to an ultra-low expansion (ULE) reference cavity, via upconversion to the near-IR spectral range, at a level of 1×10(-13). The absolute frequency of the QCL is measured relative to a hydrogen maser, with instability <1×10(-13) and inaccuracy 5×10(-13), using a frequency comb phase stabilized to an independent ultra-stable laser. The QCL linewidth is determined to be 60 Hz, dominated by fiber noise. Active suppression of fiber noise could result in sub-10 Hz linewidth.

Sources and performance criteria of uncertainty of reference measurement procedures.

PubMed

Mosca, Andrea; Paleari, Renata

2018-05-29

This article wants to focus on the today available Reference Measurement Procedures (RMPs) for the determination of various analytes in Laboratory Medicine and the possible tools to evaluate their performance in the laboratories who are currently using them. A brief review on the RMPs has been performed by investigating the Joint Committee for Traceability in Laboratory Medicine (JCTLM) database. In order to evaluate their performances, we have checked the organization of three international ring trials, i.e. those regularly performed by the IFCC External Quality assessment scheme for Reference Laboratories in Laboratory Medicine (RELA), by the Center for Disease Control and Prevention (CDC) cholesterol network and by the IFCC Network for HbA 1c . Several RMPs are available through the JCTLM database, but the best way to collect information about the RMPs and their uncertainties is to look at the reference measurement service providers (RMS). This part of the database and the background on how to listed in the database is very helpful for the assessment of expanded uncertainty (MU) and performance in general of RMPs. Worldwide, 17 RMS are listed in the database, and for most of the measurands more than one RMS is able to run the relative RMPs, with similar expanded uncertainties. As an example, for a-amylase, 4 SP offer their services with MU between 1.6 and 3.3%. In other cases (such as total cholesterol, the U may span over a broader range, i.e. from 0.02 to 3.6%). With regard to the performance evaluation, the approach is often heterogenous, and it is difficult to compare the performance of laboratories running the same RMP for the same measurand if involved in more than one EQAS. The reference measurement services have been created to help laboratory professionals and manufacturers to implement the correct metrological traceability, and the JCTLM database is the only correct way to retrieve all the necessary important information to this end. Copyright © 2018 The Canadian Society of Clinical Chemists. Published by Elsevier Inc. All rights reserved.

Reference measurement procedure for the determination of electrolytes in human blood via ICP-OES measurement

NASA Astrophysics Data System (ADS)

Grote-Koska, D.; Klauke, R.; Brand, K.; Schumann, G.

2018-04-01

The determination of electrolytes in human body fluids is one of the most frequently performed analyses in clinical routine laboratories. Metrological traceability of measurement results in patient samples is essential and requires the involvement of higher order reference measurement procedures wherever available. Here, the authors present the evaluation of a higher order reference system for the simultaneous determination of K+, Li+, Na+, Ca2+ and Mg2+ in blood serum and plasma. In the same order, the determined measurement performances were as follows: measurement ranges: 0.75 mmol l-1-75.0 mmol l-1, 0.05 mmol l-1-5.00 mmol l-1, 5 mmol l-1-200 mmol l-1, 0.4 mmol l-1-8.0 mmol l-1 and 0.1 mmol l-1-4.0 mmol l-1. Measurement imprecision: CVs were  ⩽1.1% for intra assay investigations and  ⩽1.8% for long term inter assay investigations for all measurands. Excellent accuracy was found testing certified Standard Reference Materials from NIST: SRM 909 (deviations from 0.0% to 1.1%) and SRM 956 (deviations from 0.0% to 1.5%). Intercomparisons with the German Metrology Institute (PTB) revealed differences from 0.1% to 0.8%. Matrix influences and carry over were not detectable. The expanded combined measurement uncertainties for the determination of the reference method values were estimated as  ⩾1.5% (k  =  2) for each measurand. The reference measurement procedure is accredited by the German accreditation body (DAkkS) in association with the German calibration service (DKD) according to ISO 17025 and ISO 15195. Services comprise the certification of calibrators, control materials and samples used in proficiency testing schemes.

Optical scatterometry of quarter-micron patterns using neural regression

NASA Astrophysics Data System (ADS)

Bischoff, Joerg; Bauer, Joachim J.; Haak, Ulrich; Hutschenreuther, Lutz; Truckenbrodt, Horst

1998-06-01

With shrinking dimensions and increasing chip areas, a rapid and non-destructive full wafer characterization after every patterning cycle is an inevitable necessity. In former publications it was shown that Optical Scatterometry (OS) has the potential to push the attainable feature limits of optical techniques from 0.8 . . . 0.5 microns for imaging methods down to 0.1 micron and below. Thus the demands of future metrology can be met. Basically being a nonimaging method, OS combines light scatter (or diffraction) measurements with modern data analysis schemes to solve the inverse scatter issue. For very fine patterns with lambda-to-pitch ratios grater than one, the specular reflected light versus the incidence angle is recorded. Usually, the data analysis comprises two steps -- a training cycle connected the a rigorous forward modeling and the prediction itself. Until now, two data analysis schemes are usually applied -- the multivariate regression based Partial Least Squares method (PLS) and a look-up-table technique which is also referred to as Minimum Mean Square Error approach (MMSE). Both methods are afflicted with serious drawbacks. On the one hand, the prediction accuracy of multivariate regression schemes degrades with larger parameter ranges due to the linearization properties of the method. On the other hand, look-up-table methods are rather time consuming during prediction thus prolonging the processing time and reducing the throughput. An alternate method is an Artificial Neural Network (ANN) based regression which combines the advantages of multivariate regression and MMSE. Due to the versatility of a neural network, not only can its structure be adapted more properly to the scatter problem, but also the nonlinearity of the neuronal transfer functions mimic the nonlinear behavior of optical diffraction processes more adequately. In spite of these pleasant properties, the prediction speed of ANN regression is comparable with that of the PLS-method. In this paper, the viability and performance of ANN-regression will be demonstrated with the example of sub-quarter-micron resist metrology. To this end, 0.25 micrometer line/space patterns have been printed in positive photoresist by means of DUV projection lithography. In order to evaluate the total metrology chain from light scatter measurement through data analysis, a thorough modeling has been performed. Assuming a trapezoidal shape of the developed resist profile, a training data set was generated by means of the Rigorous Coupled Wave Approach (RCWA). After training the model, a second data set was computed and deteriorated by Gaussian noise to imitate real measuring conditions. Then, these data have been fed into the models established before resulting in a Standard Error of Prediction (SEP) which corresponds to the measuring accuracy. Even with putting only little effort in the design of a back-propagation network, the ANN is clearly superior to the PLS-method. Depending on whether a network with one or two hidden layers was used, accuracy gains between 2 and 5 can be achieved compared with PLS regression. Furthermore, the ANN is less noise sensitive, for there is only a doubling of the SEP at 5% noise for ANN whereas for PLS the accuracy degrades rapidly with increasing noise. The accuracy gain also depends on the light polarization and on the measured parameters. Finally, these results have been proven experimentally, where the OS-results are in good accordance with the profiles obtained from cross- sectioning micrographs.

A new critical dimension metrology for chrome-on-glass substrates based on s-parameter measurements extracted from coplanar waveguide test structures

NASA Astrophysics Data System (ADS)

Nwokoye, Chidubem A.; Zaghloul, Mona; Cresswell, Michael W.; Allen, Richard A.; Murabito, Christine E.

2006-10-01

The technical objective of the work reported here is to assess whether radio-frequency (RF) measurements made on coplanar waveguide (CPW) test structures, which are replicated in conducting material on insulating substrates, could be employed to extract the critical dimension (CD) of the signal line using its center-to-center separation from the groundlines as a reference. The specific near-term objective is to assess whether this CPW-based CD-metrology has sensitivity and repeatability competitive with the other metrology techniques that are now used for chrome-on-glass (COG) photomasks. An affirmative answer is encouraging because advancing to a non-contact and non-vacuum implementation would then seem possible for this application. Our modeling of specific cases shows that, when the pitch of the replicated lines of the CPW is maintained constant, the sensitivity of its characteristic impedance to the CDs of the signal and ground lines is approximately 60 Ω/μm. This is a potentially useful result. For the same implementation, the quantity ∂C/∂w has a value of approximately 45 (pF/m)/μm, which appears to be large enough to provide acceptable accuracy.

A quantum network of clocks

NASA Astrophysics Data System (ADS)

Kómár, P.; Kessler, E. M.; Bishof, M.; Jiang, L.; Sørensen, A. S.; Ye, J.; Lukin, M. D.

2014-08-01

The development of precise atomic clocks plays an increasingly important role in modern society. Shared timing information constitutes a key resource for navigation with a direct correspondence between timing accuracy and precision in applications such as the Global Positioning System. By combining precision metrology and quantum networks, we propose a quantum, cooperative protocol for operating a network of geographically remote optical atomic clocks. Using nonlocal entangled states, we demonstrate an optimal utilization of global resources, and show that such a network can be operated near the fundamental precision limit set by quantum theory. Furthermore, the internal structure of the network, combined with quantum communication techniques, guarantees security both from internal and external threats. Realization of such a global quantum network of clocks may allow construction of a real-time single international time scale (world clock) with unprecedented stability and accuracy.

Metrology of semiconductor structures using novel Fabry Perot fringe stretching system

NASA Astrophysics Data System (ADS)

Walecki, Wojtek J.; Pravdivtsev, Alexander

2017-08-01

We describe patent pending fiber optic apparatus for measurements of thicknesses and distance employing low resolution spectrometer and etalon. The application of an additional known reference etalon "stretches fringes" and allows us to use Fabry Perot interference to investigate thick samples and large distances which would not be possible when using the low resolution spectrometer alone.

Wide-Field Retroreflectors

NASA Technical Reports Server (NTRS)

Page, Norman A.; Tubbs, Eldred F.

1994-01-01

Retroreflectors made of concentric spherical optical elements developed for use in interferometric metrological systems. Used to provide reference point on structure to be aligned precisely in two or three dimensions by use of intersecting laser beams. Acceptance angle much larger than that of cat's-eye or corner-cube retroreflector: Simultaneously reflects laser beams separated by angles as large as 180 degrees.

Electrical test prediction using hybrid metrology and machine learning

NASA Astrophysics Data System (ADS)

Breton, Mary; Chao, Robin; Muthinti, Gangadhara Raja; de la Peña, Abraham A.; Simon, Jacques; Cepler, Aron J.; Sendelbach, Matthew; Gaudiello, John; Emans, Susan; Shifrin, Michael; Etzioni, Yoav; Urenski, Ronen; Lee, Wei Ti

2017-03-01

Electrical test measurement in the back-end of line (BEOL) is crucial for wafer and die sorting as well as comparing intended process splits. Any in-line, nondestructive technique in the process flow to accurately predict these measurements can significantly improve mean-time-to-detect (MTTD) of defects and improve cycle times for yield and process learning. Measuring after BEOL metallization is commonly done for process control and learning, particularly with scatterometry (also called OCD (Optical Critical Dimension)), which can solve for multiple profile parameters such as metal line height or sidewall angle and does so within patterned regions. This gives scatterometry an advantage over inline microscopy-based techniques, which provide top-down information, since such techniques can be insensitive to sidewall variations hidden under the metal fill of the trench. But when faced with correlation to electrical test measurements that are specific to the BEOL processing, both techniques face the additional challenge of sampling. Microscopy-based techniques are sampling-limited by their small probe size, while scatterometry is traditionally limited (for microprocessors) to scribe targets that mimic device ground rules but are not necessarily designed to be electrically testable. A solution to this sampling challenge lies in a fast reference-based machine learning capability that allows for OCD measurement directly of the electrically-testable structures, even when they are not OCD-compatible. By incorporating such direct OCD measurements, correlation to, and therefore prediction of, resistance of BEOL electrical test structures is significantly improved. Improvements in prediction capability for multiple types of in-die electrically-testable device structures is demonstrated. To further improve the quality of the prediction of the electrical resistance measurements, hybrid metrology using the OCD measurements as well as X-ray metrology (XRF) is used. Hybrid metrology is the practice of combining information from multiple sources in order to enable or improve the measurement of one or more critical parameters. Here, the XRF measurements are used to detect subtle changes in barrier layer composition and thickness that can have second-order effects on the electrical resistance of the test structures. By accounting for such effects with the aid of the X-ray-based measurements, further improvement in the OCD correlation to electrical test measurements is achieved. Using both types of solution incorporation of fast reference-based machine learning on nonOCD-compatible test structures, and hybrid metrology combining OCD with XRF technology improvement in BEOL cycle time learning could be accomplished through improved prediction capability.

A quantum network of clocks

NASA Astrophysics Data System (ADS)

Komar, Peter; Kessler, Eric; Bishof, Michael; Jiang, Liang; Sorensen, Anders; Ye, Jun; Lukin, Mikhail

2014-05-01

Shared timing information constitutes a key resource for positioning and navigation with a direct correspondence between timing accuracy and precision in applications such as the Global Positioning System (GPS). By combining precision metrology and quantum networks, we propose here a quantum, cooperative protocol for the operation of a network consisting of geographically remote optical atomic clocks. Using non-local entangled states, we demonstrate an optimal utilization of the global network resources, and show that such a network can be operated near the fundamental limit set by quantum theory yielding an ultra-precise clock signal. Furthermore, the internal structure of the network, combined with basic techniques from quantum communication, guarantees security both from internal and external threats. Realization of such a global quantum network of clocks may allow construction of a real-time single international time scale (world clock) with unprecedented stability and accuracy. See also: Komar et al. arXiv:1310.6045 (2013) and Kessler et al. arXiv:1310.6043 (2013).

PREFACE: VII Brazilian Congress on Metrology (Metrologia 2013)

NASA Astrophysics Data System (ADS)

Costa-Félix, Rodrigo; Bernardes, Americo; Valente de Oliveira, José Carlos; Mauro Granjeiro, José; Epsztejn, Ruth; Ihlenfeld, Waldemar; Smarçaro da Cunha, Valnei

2015-01-01

SEVENTH BRAZILIAN CONGRESS ON METROLOGY (METROLOGIA 2013) Metrology and Quality for a Sustainable Development From November 24th to 27th 2013 was issued the Seventh Brazilian Congress on Metrology (Metrologia 2013), which is a biannual conference organized and sponsored by the Brazilian Society of Metrology (SBM) and the Brazilian National Institute of Metrology, Quality and Technology (Inmetro). This edition was held in the charming and historical city of Ouro Preto, MG, Brazil, and aimed to join people and institutions devoted to the dissemination of the metrology and conformity assessment. The Metrologia 2013 Conference consisted of Keynote Speeches (7) and regular papers (204). Among the regular papers, the 47 most outstanding ones, comprising a high quality content on Metrology and Conformity Assessment, were selected to be published in this issue of the Journal of Physics: Conference Series. The topics of the conference covered all important areas of Metrology, which were agglutinated in the following sessions in the present issue: . Physical Metrology (Acoustics, Vibration and Ultrasound; Electricity and Magnetism; Mechanics; Optics); . Metrology on Ionizing Radiations; . Time and Frequency; . Chemistry Metrology; . Materials Metrology; . Biotechnology; . Uncertainty, Statistics and Mathematics; . Legal Metrology; . Conformity Assessment. It is our great pleasure to present this volume of IOP Journal of Physics: Conference Series (JPCS) to the scientific community to promote further research in Metrology and related areas. We believe that this volume will be both an excellent source of scientific material in the fast evolving fields that were covered by Metrologia 2013. President of the congress Americo Bernardes Federal University of Ouro Preto atb@iceb.ufop.br Editor-in-chief Rodrigo Costa-Félix Brazilian National Institute of Metrology, Quality and Technology rpfelix@inmetro.gov.br Editors José Carlos Valente de Oliveira (Editor on Mechanical Metrology) Brazilian National Institute of Metrology, Quality and Technology jcoliveira@inmetro.gov.br José Mauro Granjeiro (Editor on Biotechnology) Brazilian National Institute of Metrology, Quality and Technology jmgranjeiro@inmetro.gov.br Ruth Epsztejn (Editor on Conformity Assessment) Brazilian National Institute of Metrology, Quality and Technology repsztejn@inmetro.gov.br Waldemar Ihlenfeld (Editor on Electrical Metrology) Brazilian National Institute of Metrology, Quality and Technology wgihlenfeld-pronametro@inmetro.gov.br Valnei Smarçaro da Cunha (Editor on Chemistry Metrology) Brazilian National Institute of Metrology, Quality and Technology vscunha@inmetro.gov.br Technical and Scientific Committee for Metrologia 2013 Ado Jório (UFMG) Carlos Achete (UFRJ, Inmetro) Flávio Vasconcelos (UFMG) Giorgio Moscati (USP) Hans Peter Grieneisen (Inmetro) Humberto Brandi (Inmetro) José Carlos Valente de Oliveira (Inmetro) José Guilherme Pereira Peixoto (IRD) José Mauro Granjeiro (Inmetro) Luiz Claudio Moreira Paschoal (Petrobras) Luis Fernado Rust (Inmetro) Luiz Silva Mello (PUC RJ) Marcos Nogueira Eberlin (Unicamp) Oleksii Kuznetsov (Inmetro) Regis Landim (Inmetro) Ricardo Carvalho (ON) Rodrigo Costa-Felix (Inmetro) Romeu José Daroda (Inmetro) Ruth Epsztejn (Inmetro) Valnei Smarçaro da Cunha (Inmetro) Valter Aibe (Inmetro) Waldemar Guilherme Kürten Ihlenfeld (PTB) Wanderley de Souza (UFRJ, Inmetro)

In-cell overlay metrology by using optical metrology tool

NASA Astrophysics Data System (ADS)

Lee, Honggoo; Han, Sangjun; Hong, Minhyung; Kim, Seungyoung; Lee, Jieun; Lee, DongYoung; Oh, Eungryong; Choi, Ahlin; Park, Hyowon; Liang, Waley; Choi, DongSub; Kim, Nakyoon; Lee, Jeongpyo; Pandev, Stilian; Jeon, Sanghuck; Robinson, John C.

2018-03-01

Overlay is one of the most critical process control steps of semiconductor manufacturing technology. A typical advanced scheme includes an overlay feedback loop based on after litho optical imaging overlay metrology on scribeline targets. The after litho control loop typically involves high frequency sampling: every lot or nearly every lot. An after etch overlay metrology step is often included, at a lower sampling frequency, in order to characterize and compensate for bias. The after etch metrology step often involves CD-SEM metrology, in this case in-cell and ondevice. This work explores an alternative approach using spectroscopic ellipsometry (SE) metrology and a machine learning analysis technique. Advanced 1x nm DRAM wafers were prepared, including both nominal (POR) wafers with mean overlay offsets, as well as DOE wafers with intentional across wafer overlay modulation. After litho metrology was measured using optical imaging metrology, as well as after etch metrology using both SE and CD-SEM for comparison. We investigate 2 types of machine learning techniques with SE data: model-less and model-based, showing excellent performance for after etch in-cell on-device overlay metrology.

The New Kilogram Definition and its Implications for High-Precision Mass Tolerance Classes.

PubMed

Abbott, Patrick J; Kubarych, Zeina J

2013-01-01

The SI unit of mass, the kilogram, is the only remaining artifact definition in the seven fundamental units of the SI system. It will be redefined in terms of the Planck constant as soon as certain experimental conditions, based on recommendations of the Consultative Committee for Mass and Related Quantities (CCM) are met. To better reflect reality, the redefinition will likely be accompanied by an increase in the uncertainties that National Metrology Institutes (NMIs) pass on to customers via artifact dissemination, which could have an impact on the reference standards that are used by secondary calibration laboratories if certain weight tolerances are adopted for use. This paper will compare the legal metrology requirements for precision mass calibration laboratories after the kilogram is redefined with the current capabilities based on the international prototype kilogram (IPK) realization of the kilogram.

Method of excess fractions with application to absolute distance metrology: wavelength selection and the effects of common error sources.

PubMed

Falaggis, Konstantinos; Towers, David P; Towers, Catherine E

2012-09-20

Multiwavelength interferometry (MWI) is a well established technique in the field of optical metrology. Previously, we have reported a theoretical analysis of the method of excess fractions that describes the mutual dependence of unambiguous measurement range, reliability, and the measurement wavelengths. In this paper wavelength, selection strategies are introduced that are built on the theoretical description and maximize the reliability in the calculated fringe order for a given measurement range, number of wavelengths, and level of phase noise. Practical implementation issues for an MWI interferometer are analyzed theoretically. It is shown that dispersion compensation is best implemented by use of reference measurements around absolute zero in the interferometer. Furthermore, the effects of wavelength uncertainty allow the ultimate performance of an MWI interferometer to be estimated.

Bringing Standardized Processes in Atom-Probe Tomography: I Establishing Standardized Terminology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Anderson, Ian M; Danoix, F; Forbes, Richard

2011-01-01

Defining standardized methods requires careful consideration of the entire field and its applications. The International Field Emission Society (IFES) has elected a Standards Committee, whose task is to determine the needed steps to establish atom-probe tomography as an accepted metrology technique. Specific tasks include developing protocols or standards for: terminology and nomenclature; metrology and instrumentation, including specifications for reference materials; test methodologies; modeling and simulations; and science-based health, safety, and environmental practices. The Committee is currently working on defining terminology related to atom-probe tomography with the goal to include terms into a document published by the International Organization for Standardsmore » (ISO). A lot of terms also used in other disciplines have already been defined) and will be discussed for adoption in the context of atom-probe tomography.« less

Evaluating droplet digital PCR for the quantification of human genomic DNA: converting copies per nanoliter to nanograms nuclear DNA per microliter.

PubMed

Duewer, David L; Kline, Margaret C; Romsos, Erica L; Toman, Blaza

2018-05-01

The highly multiplexed polymerase chain reaction (PCR) assays used for forensic human identification perform best when used with an accurately determined quantity of input DNA. To help ensure the reliable performance of these assays, we are developing a certified reference material (CRM) for calibrating human genomic DNA working standards. To enable sharing information over time and place, CRMs must provide accurate and stable values that are metrologically traceable to a common reference. We have shown that droplet digital PCR (ddPCR) limiting dilution end-point measurements of the concentration of DNA copies per volume of sample can be traceably linked to the International System of Units (SI). Unlike values assigned using conventional relationships between ultraviolet absorbance and DNA mass concentration, entity-based ddPCR measurements are expected to be stable over time. However, the forensic community expects DNA quantity to be stated in terms of mass concentration rather than entity concentration. The transformation can be accomplished given SI-traceable values and uncertainties for the number of nucleotide bases per human haploid genome equivalent (HHGE) and the average molar mass of a nucleotide monomer in the DNA polymer. This report presents the considerations required to establish the metrological traceability of ddPCR-based mass concentration estimates of human nuclear DNA. Graphical abstract The roots of metrological traceability for human nuclear DNA mass concentration results. Values for the factors in blue must be established experimentally. Values for the factors in red have been established from authoritative source materials. HHGE stands for "haploid human genome equivalent"; there are two HHGE per diploid human genome.

Modelling of the X,Y,Z positioning errors and uncertainty evaluation for the LNE’s mAFM using the Monte Carlo method

NASA Astrophysics Data System (ADS)

Ceria, Paul; Ducourtieux, Sebastien; Boukellal, Younes; Allard, Alexandre; Fischer, Nicolas; Feltin, Nicolas

2017-03-01

In order to evaluate the uncertainty budget of the LNE’s mAFM, a reference instrument dedicated to the calibration of nanoscale dimensional standards, a numerical model has been developed to evaluate the measurement uncertainty of the metrology loop involved in the XYZ positioning of the tip relative to the sample. The objective of this model is to overcome difficulties experienced when trying to evaluate some uncertainty components which cannot be experimentally determined and more specifically, the one linked to the geometry of the metrology loop. The model is based on object-oriented programming and developed under Matlab. It integrates one hundred parameters that allow the control of the geometry of the metrology loop without using analytical formulae. The created objects, mainly the reference and the mobile prism and their mirrors, the interferometers and their laser beams, can be moved and deformed freely to take into account several error sources. The Monte Carlo method is then used to determine the positioning uncertainty of the instrument by randomly drawing the parameters according to their associated tolerances and their probability density functions (PDFs). The whole process follows Supplement 2 to ‘The Guide to the Expression of the Uncertainty in Measurement’ (GUM). Some advanced statistical tools like Morris design and Sobol indices are also used to provide a sensitivity analysis by identifying the most influential parameters and quantifying their contribution to the XYZ positioning uncertainty. The approach validated in the paper shows that the actual positioning uncertainty is about 6 nm. As the final objective is to reach 1 nm, we engage in a discussion to estimate the most effective way to reduce the uncertainty.

Metrological issues related to BRDF measurements around the specular direction in the particular case of glossy surfaces

NASA Astrophysics Data System (ADS)

Obein, Gaël.; Audenaert, Jan; Ged, Guillaume; Leloup, Frédéric B.

2015-03-01

Among the complete bidirectional reflectance distribution function (BRDF), visual gloss is principally related to physical reflection characteristics located around the specular reflection direction. This particular part of the BRDF is usually referred to as the specular peak. A good starting point for the physical description of gloss could be to measure the reflection properties around this specular peak. Unfortunately, such a characterization is not trivial, since for glossy surfaces the width of the specular peak can become very narrow (typically a full width at half maximum inferior to 0.5° is encountered). In result, new BRDF measurement devices with a very small solid angle of detection are being introduced. Yet, differences in the optical design of BRDF measurement instruments engender different measurement results for the same specimen, complicating direct comparison of the measurement results. This issue is addressed in this paper. By way of example, BRDF measurement results of two samples, one being matte and the other one glossy, obtained by use of two high level goniospectrophotometers with a different optical design, are described. Important discrepancies in the results of the glossy sample are discussed. Finally, luminance maps obtained from renderings with the acquired BRDF data are presented, exemplifying the large visual differences that might be obtained. This stresses the metrological aspects that must be known for using BRDF data. Indeed, the comprehension of parameters affecting the measurement results is an inevitable step towards progress in the metrology of surface gloss, and thus towards a better metrology of appearance in general.

Comparison of contact and non-contact asphere surface metrology devices

NASA Astrophysics Data System (ADS)

DeFisher, Scott; Fess, Edward M.

2013-09-01

Metrology of asphere surfaces is critical in the precision optics industry. Surface metrology serves as feedback into deterministic grinding and polishing platforms. Many different techniques and devices are used to qualify an asphere surface during fabrication. A contact profilometer is one of the most common measurement technologies used in asphere manufacturing. A profilometer uses a fine stylus to drag a diamond or ruby tip over the surface, resulting in a high resolution curved profile. Coordinate measuring machines (CMM) apply a similar concept by touching the optic with a ruby or silicon carbine sphere. A CMM is able to move in three dimensions while collecting data points along the asphere surface. Optical interferometers use a helium-neon laser with transmission spheres to compare a reflected wavefront from an asphere surface to a reference spherical wavefront. Large departure aspheres can be measured when a computer generated hologram (CGH) is introduced between the interferometer and the optic. OptiPro Systems has developed a non-contact CMM called UltraSurf. It utilizes a single point non-contact sensor, and high accuracy air bearings. Several different commercial non-contact sensors have been integrated, allowing for the flexibility to measure a variety of surfaces and materials. Metrology of a sphere and an asphere using a profilometer, CMM, Interferometer with a CGH, and the UltraSurf will be presented. Cross-correlation of the measured surface error magnitude and shape will be demonstrated. Comparisons between the techniques and devices will be also presented with attention to accuracy, repeatability, and overall measurement time.

Evaluation of Time Transfer Units for Time and Frequency Transfer in Optical Fibers Utilizing a Passive Technique Based on SONET/SDH

DTIC Science & Technology

2012-01-01

precision and accuracy. For instance, in international time metrology, two-way satellite time and frequency transfer ( TWSTFT ) (see e.g. [1] and...can act as a time transfer system that is complementary to other high quality systems such as TWSTFT and GPS. REFERENCES [1] J. Levine. “A

Method and system for processing optical elements using magnetorheological finishing

DOEpatents

Menapace, Joseph Arthur; Schaffers, Kathleen Irene; Bayramian, Andrew James; Molander, William A

2012-09-18

A method of finishing an optical element includes mounting the optical element in an optical mount having a plurality of fiducials overlapping with the optical element and obtaining a first metrology map for the optical element and the plurality of fiducials. The method also includes obtaining a second metrology map for the optical element without the plurality of fiducials, forming a difference map between the first metrology map and the second metrology map, and aligning the first metrology map and the second metrology map. The method further includes placing mathematical fiducials onto the second metrology map using the difference map to form a third metrology map and associating the third metrology map to the optical element. Moreover, the method includes mounting the optical element in the fixture in an MRF tool, positioning the optical element in the fixture; removing the plurality of fiducials, and finishing the optical element.

Time and Frequency Transfer Activities at NIST

DTIC Science & Technology

2008-12-01

differences. The graph shows data from MJD 54466 to MJD 54763 (January 1, 2008 to October 24, 2008). II.E. The Sistema Interamericano de...Metrologia (SIM) Time Network The Sistema Interamericano de Metrologia (SIM) consists of national metrology institutes (NMIs) located in the 34...designed to mitigate multipath signals. All SIM systems are connected to the Internet and upload their measurement results to Internet Web servers

Active 2D materials for on-chip nanophotonics and quantum optics

DOE Office of Scientific and Technical Information (OSTI.GOV)

Shiue, Ren-Jye; Efetov, Dmitri K.; Grosso, Gabriele

Abstract Two-dimensional materials have emerged as promising candidates to augment existing optical networks for metrology, sensing, and telecommunication, both in the classical and quantum mechanical regimes. Here, we review the development of several on-chip photonic components ranging from electro-optic modulators, photodetectors, bolometers, and light sources that are essential building blocks for a fully integrated nanophotonic and quantum photonic circuit.

Active 2D materials for on-chip nanophotonics and quantum optics

NASA Astrophysics Data System (ADS)

Shiue, Ren-Jye; Efetov, Dmitri K.; Grosso, Gabriele; Peng, Cheng; Fong, Kin Chung; Englund, Dirk

2017-03-01

Two-dimensional materials have emerged as promising candidates to augment existing optical networks for metrology, sensing, and telecommunication, both in the classical and quantum mechanical regimes. Here, we review the development of several on-chip photonic components ranging from electro-optic modulators, photodetectors, bolometers, and light sources that are essential building blocks for a fully integrated nanophotonic and quantum photonic circuit.

A squeezed light source operated under high vacuum

PubMed Central

Wade, Andrew R.; Mansell, Georgia L.; Chua, Sheon S. Y.; Ward, Robert L.; Slagmolen, Bram J. J.; Shaddock, Daniel A.; McClelland, David E.

2015-01-01

Non-classical squeezed states of light are becoming increasingly important to a range of metrology and other quantum optics applications in cryptography, quantum computation and biophysics. Applications such as improving the sensitivity of advanced gravitational wave detectors and the development of space-based metrology and quantum networks will require robust deployable vacuum-compatible sources. To date non-linear photonics devices operated under high vacuum have been simple single pass systems, testing harmonic generation and the production of classically correlated photon pairs for space-based applications. Here we demonstrate the production under high-vacuum conditions of non-classical squeezed light with an observed 8.6 dB of quantum noise reduction down to 10 Hz. Demonstration of a resonant non-linear optical device, for the generation of squeezed light under vacuum, paves the way to fully exploit the advantages of in-vacuum operations, adapting this technology for deployment into new extreme environments. PMID:26657616

A squeezed light source operated under high vacuum

NASA Astrophysics Data System (ADS)

Wade, Andrew R.; Mansell, Georgia L.; Chua, Sheon S. Y.; Ward, Robert L.; Slagmolen, Bram J. J.; Shaddock, Daniel A.; McClelland, David E.

2015-12-01

Non-classical squeezed states of light are becoming increasingly important to a range of metrology and other quantum optics applications in cryptography, quantum computation and biophysics. Applications such as improving the sensitivity of advanced gravitational wave detectors and the development of space-based metrology and quantum networks will require robust deployable vacuum-compatible sources. To date non-linear photonics devices operated under high vacuum have been simple single pass systems, testing harmonic generation and the production of classically correlated photon pairs for space-based applications. Here we demonstrate the production under high-vacuum conditions of non-classical squeezed light with an observed 8.6 dB of quantum noise reduction down to 10 Hz. Demonstration of a resonant non-linear optical device, for the generation of squeezed light under vacuum, paves the way to fully exploit the advantages of in-vacuum operations, adapting this technology for deployment into new extreme environments.

Phase noise cancellation in polarisation-maintaining fibre links

NASA Astrophysics Data System (ADS)

Rauf, B.; Vélez López, M. C.; Thoumany, P.; Pizzocaro, M.; Calonico, D.

2018-03-01

The distribution of ultra-narrow linewidth laser radiation is an integral part of many challenging metrological applications. Changes in the optical pathlength induced by environmental disturbances compromise the stability and accuracy of optical fibre networks distributing the laser light and call for active phase noise cancellation. Here we present a laboratory scale optical (at 578 nm) fibre network featuring all polarisation maintaining fibres in a setup with low optical powers available and tracking voltage-controlled oscillators implemented. The stability and accuracy of this system reach performance levels below 1 × 10-19 after 10 000 s of averaging.

Computational metrology: enabling full-lot high-density fingerprint information without adding wafer metrology budget, and driving improved monitoring and process control

NASA Astrophysics Data System (ADS)

Kim, Hyun-Sok; Hyun, Min-Sung; Ju, Jae-Wuk; Kim, Young-Sik; Lambregts, Cees; van Rhee, Peter; Kim, Johan; McNamara, Elliott; Tel, Wim; Böcker, Paul; Oh, Nang-Lyeom; Lee, Jun-Hyung

2018-03-01

Computational metrology has been proposed as the way forward to resolve the need for increased metrology density, resulting from extending correction capabilities, without adding actual metrology budget. By exploiting TWINSCAN based metrology information, dense overlay fingerprints for every wafer can be computed. This extended metrology dataset enables new use cases, such as monitoring and control based on fingerprints for every wafer of the lot. This paper gives a detailed description, discusses the accuracy of the fingerprints computed, and will show results obtained in a DRAM HVM manufacturing environment. Also an outlook for improvements and extensions will be shared.

UTC(SU) and EOP(SU) - the only legal reference frames of Russian Federation

NASA Astrophysics Data System (ADS)

Koshelyaevsky, Nikolay B.; Blinov, Igor Yu; Pasynok, Sergey L.

2015-08-01

There are two legal time reference frames in Russian Federation. UTC(SU) deals with atomic time and play a role of reference for legal timing through the whole country. The other one, EOP(SU), deals with Earth's orientation parameters and provides the official EOP data for scientific, technical and metrological applications in Russia.The atomic time is based on two essential hardware components: primary Cs fountain standards and ensemble of continuously operating H-masers as a time unit/time scale keeper. Basing on H-maser intercomparison system data, regular H-maser frequency calibration against Cs standards and time algorithm autonomous TA(SU) time scale is maintained by the Main Metrological Center. Since 2013 time unit in TA(SU) is the second (SU) reproduced independently by VNIIFTRI Cs primary standards in accordance to it’s definition in the SI. UTC(SU) is relied on TA(SU) and steering to UTC basing on TWSTFT/GNSS time link data. As a result TA(SU) stability level relative to TT considerably exceeds 1×10-15 for sample time one month and more, RMS[UTC-UTC(SU)] ≤ 3 ns for the period of 2013-2015. UTC(SU) is broadcasted by different national means such as specialized radio and TV stations, NTP servers and GLONASS. Signals of Russian radio stations contains DUT1 and dUT1 values at 0.1s and 0.02s resolution respectively.The definitive EOP(SU) are calculated by the Main Metrological Center basing on composition of the eight independent individual EOP data streams delivered by four Russian analysis centers: VNIIFTRI, Institute of Applied Astronomy, Information-Analytical Center of Russian Space Agency and Analysis Center of Russian Space Agency. The accuracy of ultra-rapid EOP values for 2014 is estimated ≤ 0.0006" for polar motion, ≤ 70 microseconds for UT1-UTC and ≤ 0.0003" for celestial pole offsets respectively.The other VNIIFTRI EOP activities can be grouped in three basic directions:- arrangement and carrying out GNSS and SLR observations at five institutes- processing GNSS, SLR and VLBI observation data for EOP evaluation- combination of GLONASS satellites orbit/clocks.The paper will deliver more detailed and particular information on Russian legal reference frames.

Optical system design for a Lunar Optical Interferometer

NASA Technical Reports Server (NTRS)

Colavita, M. M.; Shao, M.; Hines, B. E.; Levine, B. M.; Gershman, R.

1991-01-01

The moon offers particular advantages for interferometry, including a vacuum environment, a large stable base on which to assemble multi-kilometer baselines, and a cold nighttime temperature to allow for passive cooling of optics for high IR sensitivity. A baseline design for a Lunar Optical Interferometer (LOI) which exploits these features is presented. The instrument operates in the visible to mid-IL region, and is designed for both astrometry and synthesis imaging. The design uses a Y-shaped array of 12 siderostats, with maximum arm lengths of about 1 km. The inner siderostats are monitored in three dimensions from a central laser metrology structure to allow for high precision astrometry. The outer siderostats, used primarily for synthesis imaging, exploit the availability of bright reference stars in order to determine the instrument geometry. The path delay function is partitioned into coarse and fine components, the former accomplished with switched banks of range mirrors monitored with an absolute laser metrology system, and the latter with a short cat's eye delay line. The back end of the instrument is modular, allowing for beam combiners for astrometry, visible and IR synthesis imaging, and direct planet detection. With 1 m apertures, the instrument will have a point-source imaging sensitivity of about 29 mag; with the laser metrology system, astrometry at the microarcsecond level will be possible.

Cavity Enhanced Spectrometer performance assessment for greenhouse gas dry mole fraction measurement in humid air.

NASA Astrophysics Data System (ADS)

Laurent, Olivier; Yver Kwok, Camille; Guemri, Ali; Philippon, Carole; Rivier, Leonard; Ramonet, Michel

2017-04-01

Due to the high variability of the water vapor content in the atmosphere, the mole fraction of trace gas such as greenhouse gas (GHG) in the atmosphere is usually presented as mole fraction in dry air. In consequence, the first technology used for GHG measurement, gas chromatography or non-dispersive infra-red spectroscopy, required to dry the air sample prior to analysis at a dew point lower than -50°C. The emergence of new GHG analyzers using infrared Enhanced Cavity Spectroscopy which measure the water vapor content in the air sample, allows providing the dry mole fraction of GHG without any drying system upstream by applying appropriate correction of the water vapor effects (dilution, pressure broadening…). In the framework of ICOS, a European research infrastructure aiming to provide harmonized high precision data for advanced research on carbon cycle and GHG budgets over Europe, the Metrology Lab of the Atmosphere Thematic Centre (ATC), located at LSCE in France, is mainly dedicated to elaborating measurement protocols and evaluating performance of GHG analyzers. Among the different tests conducted to characterize the metrological performance, the Metrology Lab focuses on the water vapor correction to apply on the GHG measurement. Most of the analyzers tested at the Metrology Lab are based on Cavity Enhanced Spectroscopy measuring the ICOS mandatory species, CO2, CH4 and CO. This presentation presents the results of the performance assessment of the manufacturer built-in water vapor correction and the possible improvement. Thanks to the large number of instrument tested, the presentation provides a performance overview of the GHG analyzers deployed in the ICOS atmospheric station network. Finally the performance of the water vapor correction will be discussed in regard of the performance obtained by using a drying system.

Linking results of key and supplementary comparisons of AC/DC voltage transfer references

NASA Astrophysics Data System (ADS)

Velychko, Oleh

2018-04-01

A regional key comparison (KC) COOMET.EM-K6.a and a supplementary comparison (SC) COOMET.EM-S1 of AC/DC voltage transfer references were conducted between participating laboratories from the Eurasian region. Measurements were made over the period 2004-2014. The results showed good agreement between all but one of the participating laboratories. The proposed procedure of linking results of key and SCs of regional metrology organization of AC/DC voltage transfer references is presented. Linking results is realized for COOMET.EM-K6.a and CCEM-K6.a KCs, and for COOMET.EM-K6.a KC and COOMET.EM-S1 SC.

Massive metrology using fast e-beam technology improves OPC model accuracy by >2x at faster turnaround time

NASA Astrophysics Data System (ADS)

Zhao, Qian; Wang, Lei; Wang, Jazer; Wang, ChangAn; Shi, Hong-Fei; Guerrero, James; Feng, Mu; Zhang, Qiang; Liang, Jiao; Guo, Yunbo; Zhang, Chen; Wallow, Tom; Rio, David; Wang, Lester; Wang, Alvin; Wang, Jen-Shiang; Gronlund, Keith; Lang, Jun; Koh, Kar Kit; Zhang, Dong Qing; Zhang, Hongxin; Krishnamurthy, Subramanian; Fei, Ray; Lin, Chiawen; Fang, Wei; Wang, Fei

2018-03-01

Classical SEM metrology, CD-SEM, uses low data rate and extensive frame-averaging technique to achieve high-quality SEM imaging for high-precision metrology. The drawbacks include prolonged data collection time and larger photoresist shrinkage due to excess electron dosage. This paper will introduce a novel e-beam metrology system based on a high data rate, large probe current, and ultra-low noise electron optics design. At the same level of metrology precision, this high speed e-beam metrology system could significantly shorten data collection time and reduce electron dosage. In this work, the data collection speed is higher than 7,000 images per hr. Moreover, a novel large field of view (LFOV) capability at high resolution was enabled by an advanced electron deflection system design. The area coverage by LFOV is >100x larger than classical SEM. Superior metrology precision throughout the whole image has been achieved, and high quality metrology data could be extracted from full field. This new capability on metrology will further improve metrology data collection speed to support the need for large volume of metrology data from OPC model calibration of next generation technology. The shrinking EPE (Edge Placement Error) budget places more stringent requirement on OPC model accuracy, which is increasingly limited by metrology errors. In the current practice of metrology data collection and data processing to model calibration flow, CD-SEM throughput becomes a bottleneck that limits the amount of metrology measurements available for OPC model calibration, impacting pattern coverage and model accuracy especially for 2D pattern prediction. To address the trade-off in metrology sampling and model accuracy constrained by the cycle time requirement, this paper employs the high speed e-beam metrology system and a new computational software solution to take full advantage of the large volume data and significantly reduce both systematic and random metrology errors. The new computational software enables users to generate large quantity of highly accurate EP (Edge Placement) gauges and significantly improve design pattern coverage with up to 5X gain in model prediction accuracy on complex 2D patterns. Overall, this work showed >2x improvement in OPC model accuracy at a faster model turn-around time.

A coherent fiber link for very long baseline interferometry.

PubMed

Clivati, Cecilia; Costanzo, Giovanni A; Frittelli, Matteo; Levi, Filippo; Mura, Alberto; Zucco, Massimo; Ambrosini, Roberto; Bortolotti, Claudio; Perini, Federico; Roma, Mauro; Calonico, Davide

2015-11-01

We realize a coherent fiber link for application in very long baseline interferometry (VLBI) for radio astronomy and geodesy. A 550-km optical fiber connects the Italian National Metrological Institute (INRIM) to a radio telescope in Italy and is used for the primary Cs fountain clock stability and accuracy dissemination. We use an ultrastable laser frequency- referenced to the primary standard as a transfer oscillator; at the radio telescope, an RF signal is generated from the laser by using an optical frequency comb. This scheme now provides the traceability of the local maser to the SI second, realized by the Cs fountain at the 1.7 × 10(-16) accuracy. The fiber link never limits the experiment and is robust enough to sustain radio astronomical campaigns. This experiment opens the possibility of replacing the local hydrogen masers at the VLBI sites with optically-synthesized RF signals. This could improve VLBI resolution by providing more accurate and stable frequency references and, in perspective, by enabling common- clock VLBI based on a network of telescopes connected by fiber links.

Toward reliable and repeatable automated STEM-EDS metrology with high throughput

NASA Astrophysics Data System (ADS)

Zhong, Zhenxin; Donald, Jason; Dutrow, Gavin; Roller, Justin; Ugurlu, Ozan; Verheijen, Martin; Bidiuk, Oleksii

2018-03-01

New materials and designs in complex 3D architectures in logic and memory devices have raised complexity in S/TEM metrology. In this paper, we report about a newly developed, automated, scanning transmission electron microscopy (STEM) based, energy dispersive X-ray spectroscopy (STEM-EDS) metrology method that addresses these challenges. Different methodologies toward repeatable and efficient, automated STEM-EDS metrology with high throughput are presented: we introduce the best known auto-EDS acquisition and quantification methods for robust and reliable metrology and present how electron exposure dose impacts the EDS metrology reproducibility, either due to poor signalto-noise ratio (SNR) at low dose or due to sample modifications at high dose conditions. Finally, we discuss the limitations of the STEM-EDS metrology technique and propose strategies to optimize the process both in terms of throughput and metrology reliability.

Silver Nanoparticles: Technological Advances, Societal Impacts, and Metrological Challenges

PubMed Central

Calderón-Jiménez, Bryan; Johnson, Monique E.; Montoro Bustos, Antonio R.; Murphy, Karen E.; Winchester, Michael R.; Vega Baudrit, José R.

2017-01-01

Silver nanoparticles (AgNPs) show different physical and chemical properties compared to their macroscale analogs. This is primarily due to their small size and, consequently, the exceptional surface area of these materials. Presently, advances in the synthesis, stabilization, and production of AgNPs have fostered a new generation of commercial products and intensified scientific investigation within the nanotechnology field. The use of AgNPs in commercial products is increasing and impacts on the environment and human health are largely unknown. This article discusses advances in AgNP production and presents an overview of the commercial, societal, and environmental impacts of this emerging nanoparticle (NP), and nanomaterials in general. Finally, we examine the challenges associated with AgNP characterization, discuss the importance of the development of NP reference materials (RMs) and explore their role as a metrological mechanism to improve the quality and comparability of NP measurements. PMID:28271059

Silver nanoparticles: technological advances, societal impacts, and metrological challenges

NASA Astrophysics Data System (ADS)

Calderón-Jiménez, Bryan; Johnson, Monique E.; Montoro Bustos, Antonio R.; Murphy, Karen E.; Winchester, Michael R.; Vega Baudrit, José R.

2017-02-01

Silver nanoparticles (AgNPs) show different physical and chemical properties compared to their macroscale analogs. This is primarily due to their small size and, consequently, the exceptional surface area of these materials. Presently, advances in the synthesis, stabilization, and production of AgNPs have fostered a new generation of commercial products and intensified scientific investigation within the nanotechnology field. The use of AgNPs in commercial products is increasing and impacts on the environment and human health are largely unknown. This article discusses advances in AgNP production and presents an overview of the commercial, societal, and environmental impacts of this emerging nanoparticle (NP), and nanomaterials in general. Finally, we examine the challenges associated with AgNP characterization, discuss the importance of the development of NP reference materials (RMs) and explore their role as a metrological mechanism to improve the quality and comparability of NP measurements.

Research on volume metrology method of large vertical energy storage tank based on internal electro-optical distance-ranging method

NASA Astrophysics Data System (ADS)

Hao, Huadong; Shi, Haolei; Yi, Pengju; Liu, Ying; Li, Cunjun; Li, Shuguang

2018-01-01

A Volume Metrology method based on Internal Electro-optical Distance-ranging method is established for large vertical energy storage tank. After analyzing the vertical tank volume calculation mathematical model, the key processing algorithms, such as gross error elimination, filtering, streamline, and radius calculation are studied for the point cloud data. The corresponding volume values are automatically calculated in the different liquids by calculating the cross-sectional area along the horizontal direction and integrating from vertical direction. To design the comparison system, a vertical tank which the nominal capacity is 20,000 m3 is selected as the research object, and there are shown that the method has good repeatability and reproducibility. Through using the conventional capacity measurement method as reference, the relative deviation of calculated volume is less than 0.1%, meeting the measurement requirements. And the feasibility and effectiveness are demonstrated.

Fast and accurate metrology of multi-layered ceramic materials by an automated boundary detection algorithm developed for optical coherence tomography data

PubMed Central

Ekberg, Peter; Su, Rong; Chang, Ernest W.; Yun, Seok Hyun; Mattsson, Lars

2014-01-01

Optical coherence tomography (OCT) is useful for materials defect analysis and inspection with the additional possibility of quantitative dimensional metrology. Here, we present an automated image-processing algorithm for OCT analysis of roll-to-roll multilayers in 3D manufacturing of advanced ceramics. It has the advantage of avoiding filtering and preset modeling, and will, thus, introduce a simplification. The algorithm is validated for its capability of measuring the thickness of ceramic layers, extracting the boundaries of embedded features with irregular shapes, and detecting the geometric deformations. The accuracy of the algorithm is very high, and the reliability is better than 1 µm when evaluating with the OCT images using the same gauge block step height reference. The method may be suitable for industrial applications to the rapid inspection of manufactured samples with high accuracy and robustness. PMID:24562018

Silver Nanoparticles: Technological Advances, Societal Impacts, and Metrological Challenges.

PubMed

Calderón-Jiménez, Bryan; Johnson, Monique E; Montoro Bustos, Antonio R; Murphy, Karen E; Winchester, Michael R; Vega Baudrit, José R

2017-01-01

Silver nanoparticles (AgNPs) show different physical and chemical properties compared to their macroscale analogs. This is primarily due to their small size and, consequently, the exceptional surface area of these materials. Presently, advances in the synthesis, stabilization, and production of AgNPs have fostered a new generation of commercial products and intensified scientific investigation within the nanotechnology field. The use of AgNPs in commercial products is increasing and impacts on the environment and human health are largely unknown. This article discusses advances in AgNP production and presents an overview of the commercial, societal, and environmental impacts of this emerging nanoparticle (NP), and nanomaterials in general. Finally, we examine the challenges associated with AgNP characterization, discuss the importance of the development of NP reference materials (RMs) and explore their role as a metrological mechanism to improve the quality and comparability of NP measurements.

Final report on VMI-NMISA bilateral comparison APMP.T-K3.1: Realizations of the ITS-90 over the range -38.8344 °C to 419.527 °C

NASA Astrophysics Data System (ADS)

Liedberg, Hans

2012-01-01

The Comité Consulatif de Thermométrie (CCT) has organized several key comparisons to compare realizations of the ITS-90 in different National Metrology Institutes. To keep the organization, time scale and data processing of such a comparison manageable, the number of participants in a CCT key comparison (CCT KC) is limited to a few laboratories in each major economic region. Subsequent regional key comparisons are linked to the applicable CCT KC by two or more linking laboratories. For the temperature range from 83.8058 K (triple point of Ar) to 933.473 K (freezing point of Al), a key comparison, CCT-K3, was carried out from 1997 to 2001 among representative laboratories in North America, Europe and Asia. Following CCT-K3, the Asia-Pacific Metrology Program Key Comparison 3 (APMP.T-K3) was organized for National Metrology Institutes in the Asia/Pacific region. NMIA (Australia) and KRISS (South Korea) provided the link between CCT-K3 and APMP.T-K3. APMP.T-K3, which took place from February 2000 to June 2003, covered the temperature range from -38.8344 °C (triple point of Hg) to 419.527 °C (freezing point of Zn), using a standard platinum resistance thermometer (SPRT) as the artefact. In June 2007 the Vietnam Metrology Institute (VMI) requested a bilateral comparison to link their SPRT calibration capabilities to APMP.T-K3, and in October 2007 the National Metrology Institute of South Africa (NMISA) agreed to provide the link to APMP.T-K3. Like APMP.T-K3, the comparison was restricted to the Hg to Zn temperature range to reduce the chance of drift in the SPRT artefact. The comparison was carried out in a participant-pilot-participant topology (with NMISA as the pilot and VMI as the participant). VMI's results in the comparison were linked to the Average Reference Values of CCT-K3 via NMISA's results in APMP.T-K3. The resistance ratios measured by VMI and NMISA at Zn, Sn, Ga and Hg fixed points agree within their combined uncertainties, and VMI's results also agree with the CCT-K3 reference values at these fixed points. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCT, according to the provisions of the CIPM Mutual Recognition Arrangement (MRA).

Intranet and Internet metrological workstation with photonic sensors and transmission

NASA Astrophysics Data System (ADS)

Romaniuk, Ryszard S.; Pozniak, Krzysztof T.; Dybko, Artur

1999-05-01

We describe in this paper a part of a telemetric network which consists of a workstation with photonic measurement and communication interfaces, structural fiber optic cabling (10/100BaseFX and CAN-FL), and photonic sensors with fiber optic interfaces. The station is equipped with direct photonic measurement interface and most common measuring standards converter (RS, GPIB) with fiber optic I/O CAN bus, O/E converters, LAN and modem ports. The station was connected to the Intranet (ipx/spx) and Internet (tcp/ip) with separate IP number and DNS, WINS names. Virtual measuring environment system program was written specially for such an Intranet and Internet station. The measurement system program communicated with the user via a Graphical User's Interface (GUI). The user has direct access to all functions of the measuring station system through appropriate layers of GUI: telemetric, transmission, visualization, processing, information, help and steering of the measuring system. We have carried out series of thorough simulation investigations and tests of the station using WWW subsystem of the Internet. We logged into the system through the LAN and via modem. The Internet metrological station works continuously under the address http://nms.ipe.pw.edu.pl/nms. The station and the system hear the short name NMS (from Network Measuring System).

Molecularly uniform poly(ethylene glycol) certified reference material

NASA Astrophysics Data System (ADS)

Takahashi, Kayori; Matsuyama, Shigetomo; Kinugasa, Shinichi; Ehara, Kensei; Sakurai, Hiromu; Horikawa, Yoshiteru; Kitazawa, Hideaki; Bounoshita, Masao

2015-02-01

A certified reference material (CRM) for poly(ethylene glycol) with no distribution in the degree of polymerization was developed. The degree of polymerization of the CRM was accurately determined to be 23. Supercritical fluid chromatography (SFC) was used to separate the molecularly uniform polymer from a standard commercial sample with wide polydispersity in its degree of polymerization. Through the use of a specific fractionation system coupled with SFC, we are able to obtain samples of poly(ethylene glycol) oligomer with exact degrees of polymerization, as required for a CRM produced by the National Metrology Institute of Japan.

Quantitative Evaluation of Ion-implanted Arsenic in Silicon by Instrumental Neutron Activation Analysis

NASA Astrophysics Data System (ADS)

Takatsuka, Toshiko; Hirata, Kouichi; Kobayashi, Yoshinori; Kuroiwa, Takayoshi; Miura, Tsutomu; Matsue, Hideaki

2008-11-01

Certified reference materials (CRMs) of shallow arsenic implants in silicon are now under development at the National Metrology Institute of Japan (NMIJ). The amount of ion-implanted arsenic atoms is quantified by Instrumental Neutron Activation Analysis (INAA) using research reactor JRR-3 in Japan Atomic Energy Agency (JAEA). It is found that this method can evaluate arsenic amounts of 1015 atoms/cm2 with small uncertainties, and is adaptable to shallower dopants. The estimated uncertainties can satisfy the industrial demands for reference materials to calibrate the implanted dose of arsenic at shallow junctions.

Modernization of Koesters interferometer and high accuracy calibration gauge blocks

NASA Astrophysics Data System (ADS)

França, R. S.; Silva, I. L. M.; Couceiro, I. B.; Torres, M. A. C.; Bessa, M. S.; Costa, P. A.; Oliveira, W., Jr.; Grieneisen, H. P. H.

2016-07-01

The Optical Metrology Division (Diopt) of Inmetro is responsible for maintaining the national reference of the length unit according to International System of Units (SI) definitions. The length unit is realized by interferometric techniques and is disseminated to the dimensional community through calibrations of gauge blocks. Calibration of large gauge blocks from 100 mm to 1000 mm has been performed by Diopt with a Koesters interferometer with reference to spectral lines of a krypton discharge lamp. Replacement of this lamp by frequency stabilized lasers, traceable now to the time and frequency scale, is described and the first results are reported.

MO-G-12A-01: Quantitative Imaging Metrology: What Should Be Assessed and How?

DOE Office of Scientific and Technical Information (OSTI.GOV)

Giger, M; Petrick, N; Obuchowski, N

The first two symposia in the Quantitative Imaging Track focused on 1) the introduction of quantitative imaging (QI) challenges and opportunities, and QI efforts of agencies and organizations such as the RSNA, NCI, FDA, and NIST, and 2) the techniques, applications, and challenges of QI, with specific examples from CT, PET/CT, and MR. This third symposium in the QI Track will focus on metrology and its importance in successfully advancing the QI field. While the specific focus will be on QI, many of the concepts presented are more broadly applicable to many areas of medical physics research and applications. Asmore » such, the topics discussed should be of interest to medical physicists involved in imaging as well as therapy. The first talk of the session will focus on the introduction to metrology and why it is critically important in QI. The second talk will focus on appropriate methods for technical performance assessment. The third talk will address statistically valid methods for algorithm comparison, a common problem not only in QI but also in other areas of medical physics. The final talk in the session will address strategies for publication of results that will allow statistically valid meta-analyses, which is critical for combining results of individual studies with typically small sample sizes in a manner that can best inform decisions and advance the field. Learning Objectives: Understand the importance of metrology in the QI efforts. Understand appropriate methods for technical performance assessment. Understand methods for comparing algorithms with or without reference data (i.e., “ground truth”). Understand the challenges and importance of reporting results in a manner that allows for statistically valid meta-analyses.« less

Traceable quantum sensing and metrology relied up a quantum electrical triangle principle

NASA Astrophysics Data System (ADS)

Fang, Yan; Wang, Hengliang; Yang, Xinju; Wei, Jingsong

2016-11-01

Hybrid quantum state engineering in quantum communication and imaging1-2 needs traceable quantum sensing and metrology, which are especially critical to quantum internet3 and precision measurements4 that are important across all fields of science and technology-. We aim to set up a mode of traceable quantum sensing and metrology. We developed a method by specially transforming an atomic force microscopy (AFM) and a scanning tunneling microscopy (STM) into a conducting atomic force microscopy (C-AFM) with a feedback control loop, wherein quantum entanglement enabling higher precision was relied upon a set-point, a visible light laser beam-controlled an interferometer with a surface standard at z axis, diffractometers with lateral standards at x-y axes, four-quadrant photodiode detectors, a scanner and its image software, a phase-locked pre-amplifier, a cantilever with a kHz Pt/Au conducting tip, a double barrier tunneling junction model, a STM circuit by frequency modulation and a quantum electrical triangle principle involving single electron tunneling effect, quantum Hall effect and Josephson effect5. The average and standard deviation result of repeated measurements on a 1 nm height local micro-region of nanomedicine crystal hybrid quantum state engineering surface and its differential pA level current and voltage (dI/dV) in time domains by using C-AFM was converted into an international system of units: Siemens (S), an indicated value 0.86×10-12 S (n=6) of a relative standard uncertainty was superior over a relative standard uncertainty reference value 2.3×10-10 S of 2012 CODADA quantized conductance6. It is concluded that traceable quantum sensing and metrology is emerging.

Network placement optimization for large-scale distributed system

NASA Astrophysics Data System (ADS)

Ren, Yu; Liu, Fangfang; Fu, Yunxia; Zhou, Zheng

2018-01-01

The network geometry strongly influences the performance of the distributed system, i.e., the coverage capability, measurement accuracy and overall cost. Therefore the network placement optimization represents an urgent issue in the distributed measurement, even in large-scale metrology. This paper presents an effective computer-assisted network placement optimization procedure for the large-scale distributed system and illustrates it with the example of the multi-tracker system. To get an optimal placement, the coverage capability and the coordinate uncertainty of the network are quantified. Then a placement optimization objective function is developed in terms of coverage capabilities, measurement accuracy and overall cost. And a novel grid-based encoding approach for Genetic algorithm is proposed. So the network placement is optimized by a global rough search and a local detailed search. Its obvious advantage is that there is no need for a specific initial placement. At last, a specific application illustrates this placement optimization procedure can simulate the measurement results of a specific network and design the optimal placement efficiently.

Efficient hybrid metrology for focus, CD, and overlay

NASA Astrophysics Data System (ADS)

Tel, W. T.; Segers, B.; Anunciado, R.; Zhang, Y.; Wong, P.; Hasan, T.; Prentice, C.

2017-03-01

In the advent of multiple patterning techniques in semiconductor industry, metrology has progressively become a burden. With multiple patterning techniques such as Litho-Etch-Litho-Etch and Sidewall Assisted Double Patterning, the number of processing step have increased significantly and therefore, so as the amount of metrology steps needed for both control and yield monitoring. The amount of metrology needed is increasing in each and every node as more layers needed multiple patterning steps, and more patterning steps per layer. In addition to this, there is that need for guided defect inspection, which in itself requires substantially denser focus, overlay, and CD metrology as before. Metrology efficiency will therefore be cruicial to the next semiconductor nodes. ASML's emulated wafer concept offers a highly efficient method for hybrid metrology for focus, CD, and overlay. In this concept metrology is combined with scanner's sensor data in order to predict the on-product performance. The principle underlying the method is to isolate and estimate individual root-causes which are then combined to compute the on-product performance. The goal is to use all the information available to avoid ever increasing amounts of metrology.

Optical metrology for Starlight Separated Spacecraft Stellar Interferometry Mission

NASA Technical Reports Server (NTRS)

Dubovitsky, S.; Lay, O. P.; Peters, R. D.; Abramovici, A.; Asbury, C. G.; Kuhnert, A. C.; Mulder, J. L.

2002-01-01

We describe a high-precision inter-spacecraft metrology system designed for NASA 's StarLight mission, a space-based separated-spacecraft stellar interferometer. It consists of dual-target linear metrology, based on a heterodyne interferometer with carrier phase modulation, and angular metrology designed to sense the pointing of the laser beam and provides bearing information. The dual-target operation enables one metrology beam to sense displacement of two targets independently. We present the current design, breadboard implementation of the Metrology Subsystem in a stellar interferometer testbed and the present state of development of flight qualifiable subsystem components.

7/5nm logic manufacturing capabilities and requirements of metrology

NASA Astrophysics Data System (ADS)

Bunday, Benjamin; Bello, A. F.; Solecky, Eric; Vaid, Alok

2018-03-01

This paper will provide an update to previous works [2][4][9] to our view of the future for in-line high volume manufacturing (HVM) metrology for the semiconductor industry, concentrating on logic technology for foundries. First, we will review of the needs of patterned defect, critical dimensional (CD/3D), overlay and films metrology, and present the extensive list of applications for which metrology solutions are needed. We will then update the industry's progress towards addressing gating technical limits of the most important of these metrology solutions, highlighting key metrology technology gaps requiring industry attention and investment.

Recent developments in seismic seabed oil reservoir monitoring applications using fibre-optic sensing networks

NASA Astrophysics Data System (ADS)

De Freitas, J. M.

2011-05-01

This review looks at recent developments in seismic seabed oil reservoir monitoring techniques using fibre-optic sensing networks. After a brief introduction covering the background and scope of the review, the following section focuses on state-of-the-art fibre-optic hydrophones and accelerometers used for seismic applications. Related metrology aspects of the sensor such as measurement of sensitivity, noise and cross-axis performance are addressed. The third section focuses on interrogation systems. Two main phase-based competing systems have emerged over the past two decades for seismic applications, with a third technique showing much promise; these have been compared in terms of general performance.

Comparison for Air Kerma from Radiation Protection Gamma-ray Beams with Brazilian Network - 2016/2017

NASA Astrophysics Data System (ADS)

Cabral, TS; da Silva, CNM; Potiens, MPA; Soares, CMA; Silveira, RR; Khoury, H.; Saito, V.; Fernandes, E.; Cardoso, WF; de Oliveira, HPS; Pires, MA; de Amorim, AS; Balthar, M.

2018-03-01

The results of the comparison involving 9 laboratories in Brazil are reported. The measured quantity was the air kerma in 137Cs and 60Co, at the level of radioprotection. The comparison was conducted by the National Laboratory Metrology of Ionizing Radiation (LNMRI/IRD) from October 2016 to March 2017. The largest deviation between the calibration coefficients was 0.8% for 137Cs and 0.7% for 60Co. This proficiency exercise proved the technical capacity of the Brazilian calibration network in radiation monitors and the results were used by some in the implementation of the standard ISO/IEC 17025.

Accurate Radiometry from Space: An Essential Tool for Climate Studies

NASA Technical Reports Server (NTRS)

Fox, Nigel; Kaiser-Weiss, Andrea; Schmutz, Werner; Thome, Kurtis; Young, Dave; Wielicki, Bruce; Winkler, Rainer; Woolliams, Emma

2011-01-01

The Earth s climate is undoubtedly changing; however, the time scale, consequences and causal attribution remain the subject of significant debate and uncertainty. Detection of subtle indicators from a background of natural variability requires measurements over a time base of decades. This places severe demands on the instrumentation used, requiring measurements of sufficient accuracy and sensitivity that can allow reliable judgements to be made decades apart. The International System of Units (SI) and the network of National Metrology Institutes were developed to address such requirements. However, ensuring and maintaining SI traceability of sufficient accuracy in instruments orbiting the Earth presents a significant new challenge to the metrology community. This paper highlights some key measurands and applications driving the uncertainty demand of the climate community in the solar reflective domain, e.g. solar irradiances and reflectances/radiances of the Earth. It discusses how meeting these uncertainties facilitate significant improvement in the forecasting abilities of climate models. After discussing the current state of the art, it describes a new satellite mission, called TRUTHS, which enables, for the first time, high-accuracy SI traceability to be established in orbit. The direct use of a primary standard and replication of the terrestrial traceability chain extends the SI into space, in effect realizing a metrology laboratory in space . Keywords: climate change; Earth observation; satellites; radiometry; solar irradiance

Final report on AFRIMETS.QM-K27: Determination of ethanol in aqueous matrix

NASA Astrophysics Data System (ADS)

Archer, Marcellé; Fernandes-Whaley, Maria; Visser, Ria; de Vos, Jayne; Prins, Sara; Rosso, Adriana; Ruiz de Arechavaleta, Mariana; Tahoun, Ibrahim; Kakoulides, Elias; Luvonga, Caleb; Muriira, Geoffrey; Naujalis, Evaldas; Zakaria, Osman Bin; Buzoianu, Mirella; Bebic, Jelena; Achour Mounir, Ben; Thanh, Ngo Huy

2013-01-01

From within AFRIMETS, the Regional Metrology Organization (RMO) for Africa, the RMO Key Comparison AFRIMETS.QM-K27 was coordinated by the National Metrology Institute of South Africa (NMISA) in 2011. Ten Metrology Institutes participated, comprising three AFRIMETS, two APMP, four EURAMET and one SIM participant. Participants were required to determine the forensic level concentration of two aqueous ethanol solutions that were gravimetrically prepared by the NMISA. Concentrations were expected to lie in the range of 0.1 mg/g to 5.0 mg/g. The accurate determination of ethanol content in aqueous medium is critical for regulatory forensic and trade purposes. The CCQM Organic Analysis Working Group has carried out several key comparisons (CCQM-K27 series) on the determination of ethanol in wine and aqueous matrices. Developing NMIs now had the opportunity to link to the earlier CCQM-K27 studies through the AFRIMETS.QM-K27 study. Gas chromatography coupled to flame ionisation or mass spectrometric detection was applied by eight of the participants, while three participants (including NMISA) applied titrimetry for the ethanol assay. The assigned reference value of the aqueous ethanol solutions was used to link AFRIMETS.QM-K27 to the CCQM-K27 key comparison reference value. The assigned reference values for AFRIMETS.QM-K27 Level 1 and Level 2 were (0.3249 ± 0.0021) mg/g (k = 2) and (4.6649 ± 0.0152) mg/g (k = 2), respectively. The reference values were determined using the purity-corrected gravimetric preparation values, while the standard uncertainty incorporated the gravimetric preparation and titrimetric homogeneity uncertainties. From previous CCQM-K27 studies, the expected spread (%CV) of higher order measurements of ethanol in aqueous medium is about 0.85% relative. In this study the CV for Level 1 is about 12% (10% with two outliers removed) and for Level 2 about 4%. Three of the ten laboratories submitted results within 1.5% of the gravimetric reference value for Level 1; four of the ten participating laboratories submitted mean results within 1.5% of the gravimetric reference value for Level 2. Two of the participating laboratories achieved mean results within 1.5% of the gravimetric reference value for both levels. Participants in the AFRIMETS-K27 study would therefore have benefited from a pilot study in which to test their measurement capability prior to participation in the key comparison. Several NMIs, however, will still be able to make new CMC claims based on their performance in this comparison. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCQM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Improving Metrological Reliability of Information-Measuring Systems Using Mathematical Modeling of Their Metrological Characteristics

NASA Astrophysics Data System (ADS)

Kurnosov, R. Yu; Chernyshova, T. I.; Chernyshov, V. N.

2018-05-01

The algorithms for improving the metrological reliability of analogue blocks of measuring channels and information-measuring systems are developed. The proposed algorithms ensure the optimum values of their metrological reliability indices for a given analogue circuit block solution.

Temperature metrology

NASA Astrophysics Data System (ADS)

Fischer, J.; Fellmuth, B.

2005-05-01

The majority of the processes used by the manufacturing industry depend upon the accurate measurement and control of temperature. Thermal metrology is also a key factor affecting the efficiency and environmental impact of many high-energy industrial processes, the development of innovative products and the health and safety of the general population. Applications range from the processing, storage and shipment of perishable foodstuffs and biological materials to the development of more efficient and less environmentally polluting combustion processes for steel-making. Accurate measurement and control of temperature is, for instance, also important in areas such as the characterization of new materials used in the automotive, aerospace and semiconductor industries. This paper reviews the current status of temperature metrology. It starts with the determination of thermodynamic temperatures required on principle because temperature is an intensive quantity. Methods to determine thermodynamic temperatures are reviewed in detail to introduce the underlying physical basis. As these methods cannot usually be applied for practical measurements the need for a practical temperature scale for day-to-day work is motivated. The International Temperature Scale of 1990 and the Provisional Low Temperature Scale PLTS-2000 are described as important parts of the International System of Units to support science and technology. Its main importance becomes obvious in connection with industrial development and international markets. Every country is strongly interested in unique measures, in order to guarantee quality, reproducibility and functionability of products. The eventual realization of an international system, however, is only possible within the well-functioning organization of metrological laboratories. In developed countries the government established scientific institutes have certain metrological duties, as, for instance, the maintenance and dissemination of national units. For the base unit kelvin, this procedure is described in the sections on practical temperature scales, practical thermometry and reference standards. Testing experimentally the fundamental laws of physics means in practice the precise determination of the fundamental constants appearing in the laws. The essence of current activities is that prototypes, which may vary uncontrollably with time and location, are replaced by abstract experimental prescriptions that relate the units to the constants. This approach is shown for the definition of the kelvin and the Boltzmann constant. Dedicated to the occasion of the 60th birthday of Wolfgang Buck.

Electrooptic converter to control linear displacements of the large structures of the buildings and facilities

NASA Astrophysics Data System (ADS)

Vasilev, Aleksandr S.; Konyakhin, Igor A.; Timofeev, Alexander N.; Lashmanov, Oleg U.; Molev, Fedor V.

2015-05-01

The paper analyzes the construction matters and metrological parameters of the electrooptic converter to control linear displacements of the large structures of the buildings and facilities. The converter includes the base module, the processing module and a set of the reference marks. The base module is the main unit of the system, it includes the receiving optical system and the CMOS photodetector array that realizes the instrument coordinate system that controls the mark coordinates in the space. The methods of the frame-to-frame difference, adaptive threshold filtration, binarization and objects search by the tied areas to detect the marks against accidental contrast background is the basis of the algorithm. The entire algorithm is performed during one image reading stage and is based on the FPGA. The developed and manufactured converter experimental model was tested in laboratory conditions at the metrological bench at the distance between the base module and the mark 50±0.2 m. The static characteristic was read during the experiment of the reference mark displacement at the pitch of 5 mm in the horizontal and vertical directions for the displacement range 400 mm. The converter experimental model error not exceeding ±0.5 mm was obtained in the result of the experiment.

KEY COMPARISON: Final report of the SIM 60Co absorbed-dose-to-water comparison SIM.RI(I)-K4

NASA Astrophysics Data System (ADS)

Ross, C. K.; Shortt, K. R.; Saravi, M.; Meghzifene, A.; Tovar, V. M.; Barbosa, R. A.; da Silva, C. N.; Carrizales, L.; Seltzer, S. M.

2008-01-01

Transfer chambers were used to compare the standards for 60Co absorbed dose to water maintained by seven laboratories. Six of the laboratories were members of the Sistema Interamericano de Metrología (SIM) regional metrology organization while the seventh was the International Atomic Energy Agency (IAEA) laboratory in Vienna. The National Research Council (NRC) acted as the pilot laboratory for the comparison. Because of the participation of laboratories holding primary standards, the comparison results could be linked to the key comparison reference value maintained by the Bureau International des Poids et Mesures (BIPM). The results for all laboratories were within the expanded uncertainty (two standard deviations) of the reference value. The estimated relative standard uncertainty on the comparison between any pair of laboratories ranged from 0.6% to 1.4%. The largest discrepancy between any two laboratories was 1.3%. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCRI Section I, according to the provisions of the CIPM Mutual Recognition Arrangement (MRA).

KEY COMPARISON: Final report of the SIM 60Co air-kerma comparison SIM.RI(I)-K1

NASA Astrophysics Data System (ADS)

Ross, C. K.; Shortt, K. R.; Saravi, M.; Meghzifene, A.; Tovar, V. M.; Barbosa, R. A.; da Silva, C. N.; Carrizales, L.; Seltzer, S. M.

2008-01-01

Transfer chambers were used to compare the standards for 60Co air kerma maintained by seven laboratories. Six of the laboratories are members of the Sistema Interamericano de Metrología (SIM) regional metrology organization while the seventh is the International Atomic Energy Agency (IAEA) laboratory in Vienna. The National Research Council (NRC) acted as the pilot laboratory for the comparison. Because of the participation of laboratories holding primary standards, the comparison results could be linked to the key comparison reference value maintained by the Bureau International des Poids et Mesures (BIPM). The results for all laboratories were within the expanded uncertainty (two standard deviations) of the reference value. The estimated relative standard uncertainty of the comparison between any pair of laboratories ranged from 0.5% to 1.0%. The largest discrepancy between any two laboratories was 1.0%. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCRI Section I, according to the provisions of the CIPM Mutual Recognition Arrangement (MRA).

Mask Design for the Space Interferometry Mission Internal Metrology

NASA Technical Reports Server (NTRS)

Marx, David; Zhao, Feng; Korechoff, Robert

2005-01-01

This slide presentation reviews the mask design used for the internal metrology of the Space Interferometry Mission (SIM). Included is information about the project, the method of measurements with SIM, the internal metrology, numerical model of internal metrology, wavefront examples, performance metrics, and mask design

Progress in the analysis and interpretation of N2O isotopes: Potential and future challenges

NASA Astrophysics Data System (ADS)

Mohn, Joachim; Tuzson, Béla; Zellweger, Christoph; Harris, Eliza; Ibraim, Erkan; Yu, Longfei; Emmenegger, Lukas

2017-04-01

In recent years, research on nitrous oxide (N2O) stable isotopes has significantly advanced, addressing an increasing number of research questions in biogeochemical and atmospheric sciences [1]. An important milestone was the development of quantum cascade laser based spectroscopic devices [2], which are inherently specific for structural isomers (15N14N16O vs. 14N15N16O) and capable to collect real-time data with high temporal resolution, complementary to the well-established isotope-ratio mass-spectrometry (IRMS) method. In combination with automated preconcentration, optical isotope ratio spectroscopy (OIRS) has been applied to disentangle source processes in suburban, rural and pristine environments [e.g. 3, 4]. Within the European Metrology Research Programme (EMRP) ENV52 project "Metrology for high-impact greenhouse gases (HIGHGAS)", the quality of N2O stable isotope analysis by OIRS, the comparability between laboratories, and the traceability to the international isotope ratio scales have been addressed. An inter-laboratory comparison between eleven IRMS and OIRS laboratories, organised within HIGHGAS, indicated limited comparability for 15N site preference, i.e. the difference between 15N abundance in central (N*NO) and end (*NNO) position [5]. In addition, the accuracy of the NH4NO3 decomposition reaction, which provides the link between 15N site preference and the international 15N/14N scale, was found to be limited by non-quantitative NH4NO3 decomposition in combination with substantially different isotope enrichment factors for both nitrogen atoms [6]. Results of the HIGHGAS project indicate that the following research tasks have to be completed to foster research on N2O isotopes: 1) develop improved techniques to link the 15N and 18O abundance and the 15N site preference in N2O to the international stable isotope ratio scales; 2) provide N2O reference materials, pure and diluted in an air matrix, to improve inter-laboratory compatibility. These tasks will be addressed in the upcoming European Metrology Programme for Innovation and Research (EMPIR) project "Metrology for Stable Isotope Reference Standards (SIRS)" starting in June 2017. Acknowledgement Part of this work has been carried out within the European Metrology Research Programme (EMRP) ENV52 project-HIGHGAS. The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union. References [1] S. Toyoda et al., Isotopocule analysis of biologically produced nitrous oxide in various environments, Mass Spectrom. Rev., Doi 10.1002/mas.21459 (2015). [2] J. Mohn et al., Site selective real-time measurements of atmospheric N2O isotopomers by laser spectroscopy, Atmos. Meas. Tech. 5(7), 1601-1609 (2012). [3] B. Wolf et al., First on-line isotopic characterization of N2O above intensively managed grassland, Biogeosci. 12, 2517-2531, (2015). [4] E. Harris et al., Tracking nitrous oxide emission processes at a suburban site with semi-continuous, in-situ measurements of isotopic composition, J. Geophys. Res. Atmos., accepted (2016). [5] J. Mohn et al., Interlaboratory assessment of nitrous oxide isotopomer analysis by isotope ratio mass spectrometry and laser spectroscopy: current status and perspectives, Rapid Commun. Mass Spectrom. 28, 1995-2007 (2014). [6] J. Mohn et al. Reassessment of the NH4NO3 thermal decomposition technique for calibration of the N2O isotopic composition, Rapid Commun. Mass Spectrom. 30, 2487-2496 (2016).

Ensuring Food Integrity by Metrology and FAIR Data Principles

PubMed Central

Rychlik, Michael; Zappa, Giovanna; Añorga, Larraitz; Belc, Nastasia; Castanheira, Isabel; Donard, Olivier F. X.; Kouřimská, Lenka; Ogrinc, Nives; Ocké, Marga C.; Presser, Karl; Zoani, Claudia

2018-01-01

Food integrity is a general term for sound, nutritive, healthy, tasty, safe, authentic, traceable, as well as ethically, safely, environment-friendly, and sustainably produced foods. In order to verify these properties, analytical methods with a higher degree of accuracy, sensitivity, standardization and harmonization and a harmonized system for their application in analytical laboratories are required. In this view, metrology offers the opportunity to achieve these goals. In this perspective article the current global challenges in food analysis and the principles of metrology to fill these gaps are presented. Therefore, the pan-European project METROFOOD-RI within the framework of the European Strategy Forum on Research Infrastructures (ESFRI) was developed to establish a strategy to allow reliable and comparable analytical measurements in foods along the whole process line starting from primary producers until consumers and to make all data findable, accessible, interoperable, and re-usable according to the FAIR data principles. The initiative currently consists of 48 partners from 18 European Countries and concluded its “Early Phase” as research infrastructure by organizing its future structure and presenting a proof of concept by preparing, distributing and comprehensively analyzing three candidate Reference Materials (rice grain, rice flour, and oyster tissue) and establishing a system how to compile, process, and store the generated data and how to exchange, compare them and make them accessible in data bases. PMID:29872651

Ensuring Food Integrity by Metrology and FAIR Data Principles

NASA Astrophysics Data System (ADS)

Rychlik, Michael; Zappa, Giovanna; Añorga, Larraitz; Belc, Nastasia; Castanheira, Isabel; Donard, Olivier F. X.; Kouřimská, Lenka; Ogrinc, Nives; Ocké, Marga C.; Presser, Karl; Zoani, Claudia

2018-05-01

Food integrity is a general term for sound, nutritive, healthy, tasty, safe, authentic, traceable, as well as ethically, safely, environment-friendly and sustainably produced foods. In order to verify these properties, analytical methods with a higher degree of accuracy, sensitivity, standardization and harmonization and a harmonized system for their application in analytical laboratories are required. In this view, metrology offers the opportunity to achieve these goals. In this perspective article the current global challenges in food analysis and the principles of metrology to fill these gaps are presented. Therefore, the pan-European project METROFOOD-RI within the framework of the European Strategy Forum on Research Infrastructures (ESFRI) was developed to establish a strategy to allow reliable and comparable analytical measurements in foods along the whole process line starting from primary producers until consumers and to make all data findable, accessible, interoperable, and re-usable according to the FAIR data principles. The initiative currently consists of 48 partners from 18 European Countries and concluded its “Early Phase” as research infrastructure by organizing its future structure and presenting a proof of concept by preparing, distributing and comprehensively analyzing three candidate Reference Materials (rice grain, rice flour and oyster tissue) and establishing a system how to compile, process and store the generated data and how to exchange, compare them and make them accessible in data bases.

Metrologically Traceable Determination of the Water Content in Biopolymers: INRiM Activity

NASA Astrophysics Data System (ADS)

Rolle, F.; Beltramino, G.; Fernicola, V.; Sega, M.; Verdoja, A.

2017-03-01

Water content in materials is a key factor affecting many chemical and physical properties. In polymers of biological origin, it influences their stability and mechanical properties as well as their biodegradability. The present work describes the activity carried out at INRiM on the determination of water content in samples of a commercial starch-derived biopolymer widely used in shopping bags (Mater-Bi^{circledR }). Its water content, together with temperature, is the most influencing parameter affecting its biodegradability, because of the considerable impact on the microbial activity which is responsible for the biopolymer degradation in the environment. The main scope of the work was the establishment of a metrologically traceable procedure for the determination of water content by using two electrochemical methods, namely coulometric Karl Fischer (cKF) titration and evolved water vapour (EWV) analysis. The obtained results are presented. The most significant operational parameters were considered, and a particular attention was devoted to the establishment of metrological traceability of the measurement results by using appropriate calibration procedures, calibrated standards and suitable certified reference materials. Sample homogeneity and oven-drying temperature were found to be the most important influence quantities in the whole water content measurement process. The results of the two methods were in agreement within the stated uncertainties. Further development is foreseen for the application of cKF and EWV to other polymers.

On the evaluation of photogrammetric methods for dense 3D surface reconstruction in a metrological context

NASA Astrophysics Data System (ADS)

Toschi, I.; Capra, A.; De Luca, L.; Beraldin, J.-A.; Cournoyer, L.

2014-05-01

This paper discusses a methodology to evaluate the accuracy of recently developed image-based 3D modelling techniques. So far, the emergence of these novel methods has not been supported by the definition of an internationally recognized standard which is fundamental for user confidence and market growth. In order to provide an element of reflection and solution to the different communities involved in 3D imaging, a promising approach is presented in this paper for the assessment of both metric quality and limitations of an open-source suite of tools (Apero/MicMac), developed for the extraction of dense 3D point clouds from a set of unordered 2D images. The proposed procedural workflow is performed within a metrological context, through inter-comparisons with "reference" data acquired with two hemispherical laser scanners, one total station, and one laser tracker. The methodology is applied to two case studies, designed in order to analyse the software performances in dealing with both outdoor and environmentally controlled conditions, i.e. the main entrance of Cathédrale de la Major (Marseille, France) and a custom-made scene located at National Research Council of Canada 3D imaging Metrology Laboratory (Ottawa). Comparative data and accuracy evidence produced for both tests allow the study of some key factors affecting 3D model accuracy.

Ensuring Food Integrity by Metrology and FAIR Data Principles.

PubMed

Rychlik, Michael; Zappa, Giovanna; Añorga, Larraitz; Belc, Nastasia; Castanheira, Isabel; Donard, Olivier F X; Kouřimská, Lenka; Ogrinc, Nives; Ocké, Marga C; Presser, Karl; Zoani, Claudia

2018-01-01

Food integrity is a general term for sound, nutritive, healthy, tasty, safe, authentic, traceable, as well as ethically, safely, environment-friendly, and sustainably produced foods. In order to verify these properties, analytical methods with a higher degree of accuracy, sensitivity, standardization and harmonization and a harmonized system for their application in analytical laboratories are required. In this view, metrology offers the opportunity to achieve these goals. In this perspective article the current global challenges in food analysis and the principles of metrology to fill these gaps are presented. Therefore, the pan-European project METROFOOD-RI within the framework of the European Strategy Forum on Research Infrastructures (ESFRI) was developed to establish a strategy to allow reliable and comparable analytical measurements in foods along the whole process line starting from primary producers until consumers and to make all data findable, accessible, interoperable, and re-usable according to the FAIR data principles. The initiative currently consists of 48 partners from 18 European Countries and concluded its "Early Phase" as research infrastructure by organizing its future structure and presenting a proof of concept by preparing, distributing and comprehensively analyzing three candidate Reference Materials (rice grain, rice flour, and oyster tissue) and establishing a system how to compile, process, and store the generated data and how to exchange, compare them and make them accessible in data bases.

Evaluation of 3D metrology potential using a multiple detector CDSEM

NASA Astrophysics Data System (ADS)

Hakii, Hidemitsu; Yonekura, Isao; Nishiyama, Yasushi; Tanaka, Keishi; Komoto, Kenji; Murakawa, Tsutomu; Hiroyama, Mitsuo; Shida, Soichi; Kuribara, Masayuki; Iwai, Toshimichi; Matsumoto, Jun; Nakamura, Takayuki

2012-06-01

As feature sizes of semiconductor device structures have continuously decreased, needs for metrology tools with high precision and excellent linearity over actual pattern sizes have been growing. And it has become important to measure not only two-dimensional (2D) but also three-dimensional (3D) shapes of patterns at 22 nm node and beyond. To meet requirements for 3D metrology capabilities, various pattern metrology tools have been developed. Among those, we assume that CDSEM metrology is the most qualified candidate in the light of its non-destructive, high throughput measurement capabilities that are expected to be extended to the much-awaited 3D metrology technology. On the basis of this supposition, we have developed the 3D metrology system, in which side wall angles and heights of photomask patterns can be measured with high accuracy through analyzing CDSEM images generated by multi-channel detectors. In this paper, we will discuss our attempts to measure 3D shapes of defect patterns on a photomask by using Advantest's "Multi Vision Metrology SEM" E3630 (MVM-SEM' E3630).

Experimental Demonstration of Higher Precision Weak-Value-Based Metrology Using Power Recycling

NASA Astrophysics Data System (ADS)

Wang, Yi-Tao; Tang, Jian-Shun; Hu, Gang; Wang, Jian; Yu, Shang; Zhou, Zong-Quan; Cheng, Ze-Di; Xu, Jin-Shi; Fang, Sen-Zhi; Wu, Qing-Lin; Li, Chuan-Feng; Guo, Guang-Can

2016-12-01

The weak-value-based metrology is very promising and has attracted a lot of attention in recent years because of its remarkable ability in signal amplification. However, it is suggested that the upper limit of the precision of this metrology cannot exceed that of classical metrology because of the low sample size caused by the probe loss during postselection. Nevertheless, a recent proposal shows that this probe loss can be reduced by the power-recycling technique, and thus enhance the precision of weak-value-based metrology. Here we experimentally realize the power-recycled interferometric weak-value-based beam-deflection measurement and obtain the amplitude of the detected signal and white noise by discrete Fourier transform. Our results show that the detected signal can be strengthened by power recycling, and the power-recycled weak-value-based signal-to-noise ratio can surpass the upper limit of the classical scheme, corresponding to the shot-noise limit. This work sheds light on higher precision metrology and explores the real advantage of the weak-value-based metrology over classical metrology.

Improving OCD time to solution using Signal Response Metrology

NASA Astrophysics Data System (ADS)

Fang, Fang; Zhang, Xiaoxiao; Vaid, Alok; Pandev, Stilian; Sanko, Dimitry; Ramanathan, Vidya; Venkataraman, Kartik; Haupt, Ronny

2016-03-01

In recent technology nodes, advanced process and novel integration scheme have challenged the precision limits of conventional metrology; with critical dimensions (CD) of device reduce to sub-nanometer region. Optical metrology has proved its capability to precisely detect intricate details on the complex structures, however, conventional RCWA-based (rigorous coupled wave analysis) scatterometry has the limitations of long time-to-results and lack of flexibility to adapt to wide process variations. Signal Response Metrology (SRM) is a new metrology technique targeted to alleviate the consumption of engineering and computation resources by eliminating geometric/dispersion modeling and spectral simulation from the workflow. This is achieved by directly correlating the spectra acquired from a set of wafers with known process variations encoded. In SPIE 2015, we presented the results of SRM application in lithography metrology and control [1], accomplished the mission of setting up a new measurement recipe of focus/dose monitoring in hours. This work will demonstrate our recent field exploration of SRM implementation in 20nm technology and beyond, including focus metrology for scanner control; post etch geometric profile measurement, and actual device profile metrology.

Enhanced methodology of focus control and monitoring on scanner tool

NASA Astrophysics Data System (ADS)

Chen, Yen-Jen; Kim, Young Ki; Hao, Xueli; Gomez, Juan-Manuel; Tian, Ye; Kamalizadeh, Ferhad; Hanson, Justin K.

2017-03-01

As the demand of the technology node shrinks from 14nm to 7nm, the reliability of tool monitoring techniques in advanced semiconductor fabs to achieve high yield and quality becomes more critical. Tool health monitoring methods involve periodic sampling of moderately processed test wafers to detect for particles, defects, and tool stability in order to ensure proper tool health. For lithography TWINSCAN scanner tools, the requirements for overlay stability and focus control are very strict. Current scanner tool health monitoring methods include running BaseLiner to ensure proper tool stability on a periodic basis. The focus measurement on YIELDSTAR by real-time or library-based reconstruction of critical dimensions (CD) and side wall angle (SWA) has been demonstrated as an accurate metrology input to the control loop. The high accuracy and repeatability of the YIELDSTAR focus measurement provides a common reference of scanner setup and user process. In order to further improve the metrology and matching performance, Diffraction Based Focus (DBF) metrology enabling accurate, fast, and non-destructive focus acquisition, has been successfully utilized for focus monitoring/control of TWINSCAN NXT immersion scanners. The optimal DBF target was determined to have minimized dose crosstalk, dynamic precision, set-get residual, and lens aberration sensitivity. By exploiting this new measurement target design, 80% improvement in tool-to-tool matching, >16% improvement in run-to-run mean focus stability, and >32% improvement in focus uniformity have been demonstrated compared to the previous BaseLiner methodology. Matching <2.4 nm across multiple NXT immersion scanners has been achieved with the new methodology of set baseline reference. This baseline technique, with either conventional BaseLiner low numerical aperture (NA=1.20) mode or advanced illumination high NA mode (NA=1.35), has also been evaluated to have consistent performance. This enhanced methodology of focus control and monitoring on multiple illumination conditions, opens an avenue to significantly reduce Focus-Exposure Matrix (FEM) wafer exposure for new product/layer best focus (BF) setup.

TH-A-204-02: Part II - Worldwide Radiation Metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

McEwen, M.

The ICRU is currently finalizing a report on key data for radiation dosimetry. This multi-year review has resulted in a number of recommendations regarding “fundamental” data that are used in dosimetry related to radiation therapy. This educational session will explain the background for the ICRU committee’s work, the content and conclusions of the report and the impact on outputs, including NIST primary standards, ADCL calibration coefficients and clinical reference dosimetry. Parameters and beam modalities potentially affected by this report include: The mean excitation energy, I, for graphite, air, and water, The average energy required to create an ion pair inmore » dry air (commonly referred to as W/e), The uncertainty in the determination of air kerma in kV x-rays The absolute value of Co-60 and Cs-137 primary standards and the dissemination of calibration coefficients, The determination of air kerma strength for Ir-192 HDR brachytherapy sources Ion chamber kQ factors for linac MV beams Ion chamber kQ factors for proton beams. The changes in reference dosimetry that would result from adoption of the ICRU recommendations are of the order of 0.5% to 1%, an effect that will not impact clinical dose delivery but will be detectable in the clinical setting. This session will also outline how worldwide metrology is coordinated through the Convention of the Meter and therefore how the international dosimetry community will proceed with adopting these recommendations so that uniformity from country to country in reference dosimetry is maintained. Timelines and communications methods will also be discussed to ensure that users, such as clinical medical physicists, are not surprised when their chamber’s calibration coefficient apparently changes. Learning Objectives: Understand the background for the ICRU committee’s work on key dosimetry data. Understand the proposed changes to key data and the impacts on reference dosimetry. Understand the methodology and timeline for adoption of the ICRU recommendations.« less

Evaluation of the Time and Frequency Transfer Capabilities of a Network of GNSS Receivers Located in Timing Laboratories

DTIC Science & Technology

2009-11-01

metrology, different techniques are used for time and frequency transfer, basically TWSTFT (Two-Way Satellite Time and Frequency Transfer), GPS CV (Common...traditional GPS/GLONASS CV/AV receivers and TWSTFT equipment. Time and frequency transfer using GPS code and carrier-phase is an important...or mixing GPS geodetic results with other independent techniques, such as the TWSTFT . 41 st Annual Precise Time and Time Interval (PTTI

FOREWORD: Neutron metrology Neutron metrology

NASA Astrophysics Data System (ADS)

Thomas, David J.; Nolte, Ralf; Gressier, Vincent

2011-12-01

The International Committee for Weights and Measures (CIPM) has consultative committees covering various areas of metrology. The Consultative Committee for Ionizing Radiation (CCRI) differs from the others in having three sections: Section (I) deals with radiation dosimetry, Section (II) with radionuclide metrology and Section (III) with neutron metrology. In 2003 a proposal was made to publish special issues of Metrologia covering the work of the three Sections. Section (II) was the first to complete their task, and their special issue was published in 2007, volume 44(4). This was followed in 2009 by the special issue on radiation dosimetry, volume 46(2). The present issue, volume 48(6), completes the trilogy and attempts to explain neutron metrology, the youngest of the three disciplines, the neutron only having been discovered in 1932, to a wider audience and to highlight the relevance and importance of this field. When originally approached with the idea of this special issue, Section (III) immediately saw the value of a publication specifically on neutron metrology. It is a topic area where papers tend to be scattered throughout the literature in journals covering, for example, nuclear instrumentation, radiation protection or radiation measurements in general. Review articles tend to be few. People new to the field often ask for an introduction to the various topics. There are some excellent older textbooks, but these are now becoming obsolete. More experienced workers in specific areas of neutron metrology can find it difficult to know the latest position in related areas. The papers in this issue attempt, without presenting a purely historical outline, to describe the field in a sufficiently logical way to provide the novice with a clear introduction, while being sufficiently up-to-date to provide the more experienced reader with the latest scientific developments in the different topic areas. Neutron radiation fields obviously occur throughout the nuclear industry, from the initial fuel enrichment and fabrication processes right through to storage or reprocessing, and neutron metrology is clearly important in this area. Neutron fields do, however, occur in other areas, for example where neutron sources are used in oil well logging and moisture measurements. They also occur around high energy accelerators, including photon linear accelerators used for cancer therapy, and are expected to be a more serious problem around the new hadron radiation therapy facilities. Roughly 50% of the cosmic ray doses experienced by fliers at the flight altitudes of commercial aircraft are due to neutrons. Current research on fusion presents neutron metrology with a whole new range of challenges because of the very high fluences expected. One of the most significant features of neutron fields is the very wide range of possible neutron energies. In the nuclear industry, for example, neutrons occur with energies from those of thermal neutrons at a few meV to the upper end of the fission spectrum at perhaps 10 MeV. For cosmic ray dosimetry the energy range extends into the GeV region. This enormous range sets a challenge for designing measuring devices and a parallel challenge of developing measurement standards for characterizing these devices. One of the major considerations when deciding on topics for this special issue was agreeing on what not to include. Modelling, i.e. the use of radiation transport codes, is now a very important aspect of neutron measurements. These calculations are vital for shielding and for instrument design; nevertheless, the topic has only been included here where it has a direct bearing on metrology and the development of standards. Neutron spectrometry is an increasingly important technique for unravelling some of the problems of dose equivalent measurements and for plasma diagnostics in fusion research. However, this topic is at least one step removed from primary metrology and so it was felt that it should not be covered, particularly as a compendium of papers on spectrometry for radiation protection has been published relatively recently [1]. The CIPM Mutual Recognition Arrangement (CIPM MRA), whereby national measurement standards and certificates issued by different national metrology institutes (NMIs) can be recognized internationally, is covered only briefly, although the key comparisons which underpin the CIPM MRA are highlighted. The papers included in this issue concentrate on the primary physical quantities—neutron source emission rate and neutron fluence, papers on the latter quantity covering the wide range of neutron energies for which standards are required. Neutron cross sections are fundamental to neutron physics and their importance in neutron metrology is also covered. A large amount of work by acknowledged experts in neutron metrology has gone into the preparation of this special issue and we are indebted to them for their time and effort. The list of contributors begins with the authors of the papers but also includes the referees who provided invisible but invaluable input. We are grateful for the support and encouragement of Professor Georgio Moscati, president of the CCRI when the work was proposed, Dr Kim Carneiro the current president, and Dr Penny Allisy-Roberts the executive secretary of the CCRI. When this work was first proposed a list of potential topics was drawn up by the then chairman of Section (III) Dr Horst Klein. It is a measure of his insight and knowledge of the field that the resulting document matches almost exactly the original plan he drew up. This special issue is thus a tribute to his very extensive contribution to the field. We sincerely hope its contents provide an accurate picture of the present state of neutron metrology in view of Dr Klein's conviction of the importance in metrology of getting things right. Reference [1] Thomas D J and Klein H (ed) 2003 Neutron and photon spectrometry techniques for radiation protection Radiat. Prot. Dosim. 107 1-204

Nanoscale reference materials for environmental, health and safety measurements: needs, gaps and opportunities.

PubMed

Stefaniak, Aleksandr B; Hackley, Vincent A; Roebben, Gert; Ehara, Kensei; Hankin, Steve; Postek, Michael T; Lynch, Iseult; Fu, Wei-En; Linsinger, Thomas P J; Thünemann, Andreas F

2013-12-01

The authors critically reviewed published lists of nano-objects and their physico-chemical properties deemed important for risk assessment and discussed metrological challenges associated with the development of nanoscale reference materials (RMs). Five lists were identified that contained 25 (classes of) nano-objects; only four (gold, silicon dioxide, silver, titanium dioxide) appeared on all lists. Twenty-three properties were identified for characterisation; only (specific) surface area appeared on all lists. The key themes that emerged from this review were: 1) various groups have prioritised nano-objects for development as "candidate RMs" with limited consensus; 2) a lack of harmonised terminology hinders accurate description of many nano-object properties; 3) many properties identified for characterisation are ill-defined or qualitative and hence are not metrologically traceable; 4) standardised protocols are critically needed for characterisation of nano-objects as delivered in relevant media and as administered to toxicological models; 5) the measurement processes being used to characterise a nano-object must be understood because instruments may measure a given sample in a different way; 6) appropriate RMs should be used for both accurate instrument calibration and for more general testing purposes (e.g., protocol validation); 7) there is a need to clarify that where RMs are not available, if "(representative) test materials" that lack reference or certified values may be useful for toxicology testing and 8) there is a need for consensus building within the nanotechnology and environmental, health and safety communities to prioritise RM needs and better define the required properties and (physical or chemical) forms of the candidate materials.

Metrological tests of a 200 L calibration source for HPGE detector systems for assay of radioactive waste drums.

PubMed

Boshkova, T; Mitev, K

2016-03-01

In this work we present test procedures, approval criteria and results from two metrological inspections of a certified large volume (152)Eu source (drum about 200L) intended for calibration of HPGe gamma assay systems used for activity measurement of radioactive waste drums. The aim of the inspections was to prove the stability of the calibration source during its working life. The large volume source was designed and produced in 2007. It consists of 448 identical sealed radioactive sources (modules) apportioned in 32 transparent plastic tubes which were placed in a wooden matrix which filled the drum. During the inspections the modules were subjected to tests for verification of their certified characteristics. The results show a perfect compliance with the NIST basic guidelines for the properties of a radioactive certified reference material (CRM) and demonstrate the stability of the large volume CRM-drum after 7 years of operation. Copyright © 2015 Elsevier Ltd. All rights reserved.

High-NA optical CD metrology on small in-cell targets enabling improved higher order dose control and process control for logic

NASA Astrophysics Data System (ADS)

Cramer, Hugo; Mc Namara, Elliott; van Laarhoven, Rik; Jaganatharaja, Ram; de la Fuente, Isabel; Hsu, Sharon; Belletti, Filippo; Popadic, Milos; Tu, Ward; Huang, Wade

2017-03-01

The logic manufacturing process requires small in-device metrology targets to exploit the full dose correction potential of the modern scanners and process tools. A high-NA angular resolved scatterometer (YieldStar S-1250D) was modified to demonstrate the possibility of OCD measurements on 5x5µm2 targets. The results obtained on test wafers in a logic manufacturing environment, measured after litho and after core etch, showed a good correlation to larger reference targets and AEI to ADI intra-field CDU correlation, thereby demonstrating the feasibility of OCD on such small targets. The data was used to determine a reduction potential of 55% for the intra-field CD variation, using 145 points per field on a few inner fields, and 33% of the process induced across wafer CD variation using 16 points per field full wafer. In addition, the OCD measurements reveal valuable information on wafer-to-wafer layer height variations within a lot.

Metrological properties of {CO 2}/{OsO 4} optical frequency standard

NASA Astrophysics Data System (ADS)

Acef, O.

1997-02-01

Recent progress on the metrological performance of the BNM-LPTF {CO 2}/{OsO 4} frequency standards in the {28}/{29}THz range, using OsO 4 molecular transitions as a frequency reference is reported. Significant improvements in terms of both short-term stability ( {6.6×10 -14}/{τup to τ=300s }) and long-term stability (4 × 10 -15 up to τ = 1 000 s, Δν ˜ 0.1 Hz) are obtained. Long term reproducibility (over more than 18 months) of about 3 × 10 -13 has been achieved. This high level enables the transfer, in terms of absolute frequency at the 3 × 10 -13 level of uncertainty, from primary frequency standards in the microwave domain to near infrared and visible domains, using frequency chains with {CO 2}/{OsO 4} as a transfer frequency standard. Preliminary estimates of the main effects which may shift the OsO 4 center line are reported.

Advanced CD-SEM solution for edge placement error characterization of BEOL pitch 32nm metal layers

NASA Astrophysics Data System (ADS)

Charley, A.; Leray, P.; Lorusso, G.; Sutani, T.; Takemasa, Y.

2018-03-01

Metrology plays an important role in edge placement error (EPE) budgeting. Control for multi-patterning applications as new critical distances needs to be measured (edge to edge) and requirements become tighter and tighter in terms of accuracy and precision. In this paper we focus on imec iN7 BEOL platform and particularly on M2 patterning scheme using SAQP + block EUV for a 7.5 track logic design. Being able to characterize block to SAQP edge misplacement is important in a budgeting exercise (1) but is also extremely difficult due to challenging edge detection with CD-SEM (similar materials, thin layers, short distances, 3D features). In this study we develop an advanced solution to measure block to SAQP placement, we characterize it in terms of sensitivity, precision and accuracy through the comparison to reference metrology. In a second phase, the methodology is applied to budget local effects and the results are compared to the characterization of the SAQP and block independently.

Reduction of wafer-edge overlay errors using advanced correction models, optimized for minimal metrology requirements

NASA Astrophysics Data System (ADS)

Kim, Min-Suk; Won, Hwa-Yeon; Jeong, Jong-Mun; Böcker, Paul; Vergaij-Huizer, Lydia; Kupers, Michiel; Jovanović, Milenko; Sochal, Inez; Ryan, Kevin; Sun, Kyu-Tae; Lim, Young-Wan; Byun, Jin-Moo; Kim, Gwang-Gon; Suh, Jung-Joon

2016-03-01

In order to optimize yield in DRAM semiconductor manufacturing for 2x nodes and beyond, the (processing induced) overlay fingerprint towards the edge of the wafer needs to be reduced. Traditionally, this is achieved by acquiring denser overlay metrology at the edge of the wafer, to feed field-by-field corrections. Although field-by-field corrections can be effective in reducing localized overlay errors, the requirement for dense metrology to determine the corrections can become a limiting factor due to a significant increase of metrology time and cost. In this study, a more cost-effective solution has been found in extending the regular correction model with an edge-specific component. This new overlay correction model can be driven by an optimized, sparser sampling especially at the wafer edge area, and also allows for a reduction of noise propagation. Lithography correction potential has been maximized, with significantly less metrology needs. Evaluations have been performed, demonstrating the benefit of edge models in terms of on-product overlay performance, as well as cell based overlay performance based on metrology-to-cell matching improvements. Performance can be increased compared to POR modeling and sampling, which can contribute to (overlay based) yield improvement. Based on advanced modeling including edge components, metrology requirements have been optimized, enabling integrated metrology which drives down overall metrology fab footprint and lithography cycle time.

Metrology in physics, chemistry, and biology: differing perceptions.

PubMed

Iyengar, Venkatesh

2007-04-01

The association of physics and chemistry with metrology (the science of measurements) is well documented. For practical purposes, basic metrological measurements in physics are governed by two components, namely, the measure (i.e., the unit of measurement) and the measurand (i.e., the entity measured), which fully account for the integrity of a measurement process. In simple words, in the case of measuring the length of a room (the measurand), the SI unit meter (the measure) provides a direct answer sustained by metrological concepts. Metrology in chemistry, as observed through physical chemistry (measures used to express molar relationships, volume, pressure, temperature, surface tension, among others) follows the same principles of metrology as in physics. The same basis percolates to classical analytical chemistry (gravimetry for preparing high-purity standards, related definitive analytical techniques, among others). However, certain transition takes place in extending the metrological principles to chemical measurements in complex chemical matrices (e.g., food samples), as it adds a third component, namely, indirect measurements (e.g., AAS determination of Zn in foods). This is a practice frequently used in field assays, and calls for additional steps to account for traceability of such chemical measurements for safeguarding reliability concerns. Hence, the assessment that chemical metrology is still evolving.

MSFC Optical Metrology: A National Resource

NASA Technical Reports Server (NTRS)

Burdine, Robert

1998-01-01

A national need exists for Large Diameter Optical Metrology Services. These services include the manufacture, testing, and assurance of precision and control necessary to assure the success of large optical projects. "Best Practices" are often relied on for manufacture and quality controls while optical projects are increasingly more demanding and complex. Marshall Space Flight Center (MSFC) has acquired unique optical measurement, testing and metrology capabilities through active participation in a wide variety of NASA optical programs. An overview of existing optical facilities and metrology capabilities is given with emphasis on use by other optical projects. Cost avoidance and project success is stressed through use of existing MSFC facilities and capabilities for measurement and metrology controls. Current issues in large diameter optical metrology are briefly reviewed. The need for a consistent and long duration Large Diameter Optical Metrology Service Group is presented with emphasis on the establishment of a National Large Diameter Optical Standards Laboratory. Proposals are made to develop MSFC optical standards and metrology capabilities as the primary national standards resource, providing access to MSFC Optical Core Competencies for manufacturers and researchers. Plans are presented for the development of a national lending library of precision optical standards with emphasis on cost avoidance while improving measurement assurance.

Ionospheric signatures of Lightning

NASA Astrophysics Data System (ADS)

Hsu, M.; Liu, J.

2003-12-01

The geostationary metrology satellite (GMS) monitors motions of thunderstorm cloud, while the lightning detection network (LDN) in Taiwan and the very high Frequency (VHF) radar in Chung-Li (25.0›XN, 121.2›XE) observed occurrences of lightning during May and July, 1997. Measurements from the digisonde portable sounder (DPS) at National Central University shows that lightning results in occurrence of the sporadic E-layer (Es), as well as increase and decrease of plasma density at the F2-peak and E-peak in the ionosphere, respectively. A network of ground-based GPS receivers is further used to monitor the spatial distribution of the ionospheric TEC. To explain the plasma density variations, a model is proposed.

EuCARD2: enhanced accelerator research and development in Europe

NASA Astrophysics Data System (ADS)

Romaniuk, Ryszard S.

2013-10-01

Accelerator science and technology is one of a key enablers of the developments in the particle physic, photon physics and also applications in medicine and industry. EuCARD2 is an European research project which will be realized during 2013-2017 inside the EC FP7 framework. The project concerns the development and coordination of European Accelerator Research and Development. The project is particularly important, to a number of domestic laboratories, due to some plans to build large accelerator infrastructure in Poland. Large accelerator infrastructure of fundamental and applied research character stimulates around it the development and industrial applications as well as biomedical of advanced accelerators, material research and engineering, cryo-technology, mechatronics, robotics, and in particular electronics - like networked measurement and control systems, sensors, computer systems, automation and control systems. The paper presents a digest of the European project EuCARD2 which is Enhanced European Coordination for Accelerator Research and Development. The paper presents a digest of the research results and assumptions in the domain of accelerator science and technology in Europe, shown during the final fourth annual meeting of the EuCARD - European Coordination of Accelerator R&D, and the kick-off meeting of the EuCARD2. There are debated a few basic groups of accelerator systems components like: measurement - control networks of large geometrical extent, multichannel systems for large amounts of metrological data acquisition, precision photonic networks of reference time, frequency and phase distribution, high field magnets, superconducting cavities, novel beam collimators, etc. The paper bases on the following materials: Internet and Intranet documents combined with EuCARD2, Description of Work FP7 EuCARD-2 DoW-312453, 2013-02-13, and discussions and preparatory materials worked on by Eucard-2 initiators.

Development of a mushroom powder Certified Reference Material for calcium, arsenic, cadmium and lead measurements.

PubMed

Chew, Gina; Sim, Lay Peng; Ng, Sin Yee; Ding, Yi; Shin, Richard Y C; Lee, Tong Kooi

2016-01-01

Isotope dilution mass spectrometry and standard addition techniques were developed for the analysis of four elements (Ca, As, Cd and Pb) in a mushroom powder material. Results from the validated methods were compared to those of other national metrology institutes in the CCQM-K89 intercomparisons and the results were in excellent agreement with the reference values. The same methods were then used for the assignment of reference values to a mushroom powder Certified Reference Material (CRM). The certified values obtained for Ca, As, Cd and Pb were 1.444 ± 0.099 mg/g, 5.61 ± 0.59 mg/kg, 1.191 ± 0.079 mg/kg and 5.23 ± 0.94 mg/kg, respectively. The expanded measurement uncertainties were obtained by combining the uncertainty contributions from characterization (uchar) and between-bottle homogeneity (ubb). Copyright © 2015 Elsevier Ltd. All rights reserved.

Certification of reference materials for the determination of alkylphenols.

PubMed

Hanari, Nobuyasu; Ishikawa, Keiichiro; Shimizu, Yoshitaka; Otsuka, Satoko; Iwasawa, Ryoko; Fujiki, Naomi; Numata, Masahiko; Yarita, Takashi; Kato, Kenji

2015-04-01

Certified reference materials (CRMs) are playing an increasingly important role in national and international standardizing activities. In Japan, primary standard solutions for analyses of endocrine disrupters are supplied under the national standards dissemination system named the Japan Calibration Service System (JCSS). For the traceability on reference materials used for preparation of the primary standard solutions based on the JCSS, the National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (NMIJ/AIST) has developed and certified high-purity reference materials of alkylphenols as NMIJ CRMs, such as 4-n-nonylphenol, 4-tert-octylphenol, 4-n-heptylphenol, 4-tert-butylphenol, and 2,4-dichlorophenol. Thereafter, it is essential to determine the alkylphenols by using these solutions based on the JCSS for environmental monitoring and risk assessments because analytical values obtained by using the solutions can ensure the reliability and traceability of the chemical analyses.

Ultrasound Metrology in Mexico: a round robin test for medical diagnostics

NASA Astrophysics Data System (ADS)

Amezola Luna, R.; López Sánchez, A. L.; Elías Juárez, A. A.

2011-02-01

This paper presents preliminary statistical results from an on-going imaging medical ultrasound study, of particular relevance for gynecology and obstetrics areas. Its scope is twofold, firstly to compile the medical ultrasound infrastructure available in cities of Queretaro-Mexico, and second to promote the use of traceable measurement standards as a key aspect to assure quality of ultrasound examinations performed by medical specialists. The experimental methodology is based on a round robin test using an ultrasound phantom for medical imaging. The physician, using its own ultrasound machine, couplant and facilities, measures the size and depth of a set of pre-defined reflecting and absorbing targets of the reference phantom, which simulate human illnesses. Measurements performed give the medical specialist an objective feedback regarding some performance characteristics of their ultrasound examination systems, such as measurement system accuracy, dead zone, axial resolution, depth of penetration and anechoic targets detection. By the end of March 2010, 66 entities with medical ultrasound facilities, from both public and private institutions, have performed measurements. A network of medical ultrasound calibration laboratories in Mexico, with traceability to The International System of Units via national measurement standards, may indeed contribute to reduce measurement deviations and thus attain better diagnostics.

Final report on the Seventh International Comparison of Absolute Gravimeters (ICAG 2005)

USGS Publications Warehouse

Jiang, Z.; Francis, O.; Vitushkin, L.; Palinkas, V.; Germak, A.; Becker, M.; D'Agostino, G.; Amalvict, M.; Bayer, R.; Bilker-Koivula, M.; Desogus, S.; Faller, J.; Falk, R.; Hinderer, J.; Gagnon, C.; Jakob, T.; Kalish, E.; Kostelecky, J.; Lee, C.; Liard, J.; Lokshyn, Y.; Luck, B.; Makinen, J.; Mizushima, S.; Le, Moigne N.; Origlia, C.; Pujol, E.R.; Richard, P.; Robertsson, L.; Ruess, D.; Schmerge, D.; Stus, Y.; Svitlov, S.; Thies, S.; Ullrich, C.; Van Camp, M.; Vitushkin, A.; Ji, W.; Wilmes, H.

2011-01-01

The Bureau International des Poids et Mesures (BIPM), S??vres, France, hosted the 7th International Comparison of Absolute Gravimeters (ICAG) and the associated Relative Gravity Campaign (RGC) from August to September 2005. ICAG 2005 was prepared and performed as a metrological pilot study, which aimed: To determine the gravity comparison reference values; To determine the offsets of the absolute gravimeters; and As a pilot study to accumulate experience for the CIPM Key Comparisons. This document presents a complete and extensive review of the technical protocol and data processing procedures. The 1st ICAG-RGC comparison was held at the BIPM in 1980-1981 and since then meetings have been organized every 4 years. In this paper, we present an overview of how the meeting was organized, the conditions of BIPM gravimetric sites, technical specifications, data processing strategy and an analysis of the final results. This 7th ICAG final report supersedes all previously published reports. Readings were obtained from participating instruments, 19 absolute gravimeters and 15 relative gravimeters. Precise levelling measurements were carried out and all measurements were performed on the BIPM micro-gravity network which was specifically designed for the comparison. ?? 2011 BIPM & IOP Publishing Ltd.

Component-Level Demonstration of a Microfabricated Atomic Frequency Reference

DTIC Science & Technology

2005-08-01

Kitching, L. A. Liew, and J. Moreland, "A microfabricated atomic clock," Applied Physics Letters, vol. 85, pp. 1460-1462, 2004. [4] R. Lutwak , P...Symposium on Frequency Standards and Metrology, P. Gill, Ed. St. Andrews, Scotland: World Scientific, 2001, pp. 155-166. [31] R. Lutwak , D. Emmons...Frequency and Time Forum. Tampa, FL, 2003, pp. 31-32. [71] R. Lutwak , D. Emmons, T. English, W. Riley, A. Duwel, M. Varghese, D. K. Serkland, and

Sediment certified reference materials for the determination of polychlorinated biphenyls and organochlorine pesticides from the National Metrology Institute of Japan (NMIJ).

PubMed

Numata, Masahiko; Yarita, Takashi; Aoyagi, Yoshie; Tsuda, Yoko; Yamazaki, Misako; Takatsu, Akiko; Ishikawa, Keiichiro; Chiba, Koichi; Okamaoto, Kensaku

2007-04-01

Two marine sediment certified reference materials, NMIJ CRM 7304-a and 7305-a, have been issued by the National Metrology Institute of Japan in the National Institute of Advanced Industrial Science and Technology (NMIJ/AIST) for the determination of polychlorinated biphenyls (PCBs) and organochlorine pesticides (OCPs). The raw materials of the CRMs were collected from a bay near industrial activity in Japan. Characterization of these CRMs was conducted by NMIJ, where the sediments were analyzed using multiple analytical methods such as pressurized liquid extraction (PLE), microwave-assisted extraction (MAE), saponification, Soxhlet extraction, supercritical fluid extraction (SFE), and ultrasonic extraction; the target compounds were determined by one of the primary methods of measurements, isotope dilution-mass spectrometry (ID-MS). Certified values have been provided for 14 PCB congeners (PCB numbers 3, 15, 28, 31, 70, 101, 105, 138, 153, 170, 180, 194, 206, 209) and 4 OCPs (gamma-HCH, 4,4'-DDT, 4,4'-DDE, 4,4'-DDD) in both CRMs. NMIJ CRM 7304-a has concentrations of the contaminants that are a factor of 2-15 greater than in CRM 7305-a. Both CRMs have information values for PCB homolog concentrations determined by collaborative analysis using a Japanese official method for determination of PCBs. The total PCB concentrations in the CRMs are approximately 920 and 86 microg kg(-1) dry mass respectively.

Evaluating a hybrid three-dimensional metrology system: merging data from optical and touch probe devices

NASA Astrophysics Data System (ADS)

Gerde, Janice R.; Christens-Barry, William A.

2011-08-01

In a project to meet requirements for CBP Laboratory analysis of footwear under the Harmonized Tariff Schedule of the United States (HTSUS), a hybrid metrology system comprising both optical and touch probe devices has been assembled. A unique requirement must be met: To identify the interface-typically obscured in samples of concern-of the "external surface area upper" (ESAU) and the sole without physically destroying the sample. The sample outer surface is determined by discrete point cloud coordinates obtained using laser scanner optical measurements. Measurements from the optically inaccessible insole region are obtained using a coordinate measuring machine (CMM). That surface similarly is defined by point cloud data. Mathematically, the individual CMM and scanner data sets are transformed into a single, common reference frame. Custom software then fits a polynomial surface to the insole data and extends it to intersect the mesh fitted to the outer surface point cloud. This line of intersection defines the required ESAU boundary, thus permitting further fractional area calculations to determine the percentage of materials present. With a draft method in place, and first-level method validation underway, we examine the transformation of the two dissimilar data sets into the single, common reference frame. We also will consider the six previously-identified potential error factors versus the method process. This paper reports our on-going work and discusses our findings to date.

Overlay accuracy fundamentals

NASA Astrophysics Data System (ADS)

Kandel, Daniel; Levinski, Vladimir; Sapiens, Noam; Cohen, Guy; Amit, Eran; Klein, Dana; Vakshtein, Irina

2012-03-01

Currently, the performance of overlay metrology is evaluated mainly based on random error contributions such as precision and TIS variability. With the expected shrinkage of the overlay metrology budget to < 0.5nm, it becomes crucial to include also systematic error contributions which affect the accuracy of the metrology. Here we discuss fundamental aspects of overlay accuracy and a methodology to improve accuracy significantly. We identify overlay mark imperfections and their interaction with the metrology technology, as the main source of overlay inaccuracy. The most important type of mark imperfection is mark asymmetry. Overlay mark asymmetry leads to a geometrical ambiguity in the definition of overlay, which can be ~1nm or less. It is shown theoretically and in simulations that the metrology may enhance the effect of overlay mark asymmetry significantly and lead to metrology inaccuracy ~10nm, much larger than the geometrical ambiguity. The analysis is carried out for two different overlay metrology technologies: Imaging overlay and DBO (1st order diffraction based overlay). It is demonstrated that the sensitivity of DBO to overlay mark asymmetry is larger than the sensitivity of imaging overlay. Finally, we show that a recently developed measurement quality metric serves as a valuable tool for improving overlay metrology accuracy. Simulation results demonstrate that the accuracy of imaging overlay can be improved significantly by recipe setup optimized using the quality metric. We conclude that imaging overlay metrology, complemented by appropriate use of measurement quality metric, results in optimal overlay accuracy.

Sub-microradian Surface Slope Metrology with the ALS Developmental Long Trace Profiler

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yashchuk, Valeriy V.; Barber, Samuel; Domning, Edward E.

2009-06-15

Development of X-ray optics for 3rd and 4th generation X-ray light sources with a level of surface slope precision of 0.1-0.2 {micro}rad requires the development of adequate fabrication technologies and dedicated metrology instrumentation and methods. Currently, the best performance of surface slope measurement has been achieved with the NOM (Nanometer Optical Component Measuring Machine) slope profiler at BESSY (Germany) [1] and the ESAD (Extended Shear Angle Difference) profiler at the PTB (Germany) [2]. Both instruments are based on electronic autocollimators (AC) precisely calibrated for the specific application [3] with small apertures of 2.5-5 mm in diameter. In the present work,more » we describe the design, initial alignment and calibration procedures, the instrumental control and data acquisition system, as well as the measurement performance of the Developmental Long Trace Profiler (DLTP) slope measuring instrument recently brought into operation at the Advanced Light Source (ALS) Optical Metrology Laboratory (OML). Similar to the NOM and ESAD, the DLTP is based on a precisely calibrated autocollimator. However, this is a reasonably low budget instrument used at the ALS OML for the development and testing of new measuring techniques and methods. Some of the developed methods have been implemented into the ALS LTP-II (slope measuring long trace profiler [4]) which was recently upgraded and has demonstrated a capability for 0.25 {micro}rad surface metrology [5]. Performance of the DLTP was verified via a number of measurements with high quality reference mirrors. A comparison with the corresponding results obtained with the world's best slope measuring instrument, the BESSY NOM, proves the accuracy of the DLTP measurements on the level of 0.1-0.2 {micro}rad depending on the curvature of a surface under test. The directions of future work to develop a surface slope measuring profiler with nano-radian performance are also discussed.« less

Assessment of the present NASA optical metrology capabilities and recommendations for establishing an in-house NASA Optical Metrology Group

NASA Technical Reports Server (NTRS)

Parks, Robert E.

1991-01-01

An investigation into when it was first recognized that there was a deficiency in NASA optical metrology oversight capability, why this deficiency existed unnoticed for so long, and a proposal for correcting the problem is presented. It is explained why this optical metrology oversight is so critical to program success and at the same time, why it is difficult to establish due to the nature of the technology. The solution proposed is the establishment of an Optics Metrology Group within the NASA/MSFC Optics Branch with a line of authority from NASA S & MA.

Metrological AFMs and its application for versatile nano-dimensional metrology tasks

NASA Astrophysics Data System (ADS)

Dai, Gaoliang; Dziomba, T.; Pohlenz, F.; Danzebrink, H.-U.; Koenders, L.

2010-08-01

Traceable calibrations of various micro and nano measurement devices are crucial tasks for ensuring reliable measurements for micro and nanotechnology. Today metrological AFM are widely used for traceable calibrations of nano dimensional standards. In this paper, we introduced the developments of metrological force microscopes at PTB. Of the three metrological AFMs described here, one is capable of measuring in a volume of 25 mm x 25 mm x 5 mm. All instruments feature interferometers and the three-dimensional position measurements are thus directly traceable to the metre definition. Some calibration examples on, for instance, flatness standards, step height standards, one and two dimensional gratings are demonstrated.

Metrological Support in Technosphere Safety

NASA Astrophysics Data System (ADS)

Akhobadze, G. N.

2017-11-01

The principle of metrological support in technosphere safety is considered. It is based on the practical metrology. The theoretical aspects of accuracy and errors of the measuring instruments intended for diagnostics and control of the technosphere under the influence of factors harmful to human beings are presented. The necessity to choose measuring devices with high metrological characteristics according to the accuracy class and contact of sensitive elements with a medium under control is shown. The types of additional errors in measuring instruments that arise when they are affected by environmental influences are described. A specific example of the analyzers application to control industrial emissions and measure the oil and particulate matter in wastewater is shown; it allows assessing advantages and disadvantages of analyzers. Besides, the recommendations regarding the missing metrological characteristics of the instruments in use are provided. The technosphere continuous monitoring taking into account the metrological principles is expected to efficiently forecast the technosphere development and make appropriate decisions.

PREFACE: 13th International Conference on Metrology and Properties of Engineering Surfaces

NASA Astrophysics Data System (ADS)

Leach, Richard

2011-08-01

The 13th International Conference on Metrology and Properties of Engineering Surfaces focused on the progress in surface metrology, surface characterisation instrumentation and properties of engineering surfaces. The conference provided an international forum for academics, industrialists and engineers from different disciplines to meet and exchange their ideas, results and latest research. The conference was held at Twickenham Stadium, situated approximately six miles from Heathrow Airport and approximately three miles from the National Physical Laboratory (NPL). This was the thirteenth in the very successful series of conferences, which have firmly established surface topography as a new and exciting interdisciplinary field of scientific and technological studies. Scientific Themes: Surface, Micro and Nano Metrology Measurement and Instrumentation Metrology for MST Devices Freeform Surface Measurement and Characterisation Uncertainty, Traceability and Calibration AFM/SPM Metrology Tribology and Wear Phenomena Functional Applications Stylus and Optical Instruments

A Roadmap for Thermal Metrology

NASA Astrophysics Data System (ADS)

Bojkovski, J.; Fischer, J.; Machin, G.; Pavese, F.; Peruzzi, A.; Renaot, E.; Tegeler, E.

2009-02-01

A provisional roadmap for thermal metrology was developed in Spring 2006 as part of the EUROMET iMERA activity toward increasing impact from national investment in European metrology R&D. This consisted of two parts: one addressing the influence of thermal metrology on society, industry, and science, and the other specifying the requirements of enabling thermal metrology to serve future needs. The roadmap represents the shared vision of the EUROMET TC Therm committee as to how thermal metrology should develop to meet future requirements over the next 15 years. It is important to stress that these documents are a first attempt to roadmap the whole of thermal metrology and will certainly need regular review and revision to remain relevant and useful to the community they seek to serve. The first part of the roadmap, “Thermal metrology for society, industry, and science,” identifies the main social and economic triggers driving developments in thermal metrology—notably citizen safety and security, new production technologies, environment and global climate change, energy, and health. Stemming from these triggers, key targets are identified that require improved thermal measurements. The second part of the roadmap, “Enabling thermal metrology to serve future needs” identifies another set of triggers, like global trade and interoperability, future needs in transport, and the earth radiation budget. Stemming from these triggers, key targets are identified, such as improved realizations and dissemination of the SI unit the kelvin, anchoring the kelvin to the Boltzmann constant, k B, and calculating thermal properties from first principles. To facilitate these outcomes, the roadmap identifies the technical advances required in thermal measurement standards.

Metrology needs for the semiconductor industry over the next decade

NASA Astrophysics Data System (ADS)

Melliar-Smith, Mark; Diebold, Alain C.

1998-11-01

Metrology will continue to be a key enabler for the development and manufacture of future generations of integrated circuits. During 1997, the Semiconductor Industry Association renewed the National Technology Roadmap for Semiconductors (NTRS) through the 50 nm technology generation and for the first time included a Metrology Roadmap (1). Meeting the needs described in the Metrology Roadmap will be both a technological and financial challenge. In an ideal world, metrology capability would be available at the start of process and tool development, and silicon suppliers would have 450 mm wafer capable metrology tools in time for development of that wafer size. Unfortunately, a majority of the metrology suppliers are small companies that typically can't afford the additional two to three year wait for return on R&D investment. Therefore, the success of the semiconductor industry demands that we expand cooperation between NIST, SEMATECH, the National Labs, SRC, and the entire community. In this paper, we will discuss several critical metrology topics including the role of sensor-based process control, in-line microscopy, focused measurements for transistor and interconnect fabrication, and development needs. Improvements in in-line microscopy must extend existing critical dimension measurements up to 100 nm generations and new methods may be required for sub 100 nm generations. Through development, existing metrology dielectric thickness and dopant dose and junction methods can be extended to 100 nm, but new and possibly in-situ methods are needed beyond 100 nm. Interconnect process control will undergo change before 100 nm due to the introduction of copper metallization, low dielectric constant interlevel dielectrics, and Damascene process flows.

Assessing the Economic and National Security Benefits from Publicly Funded Technology Investments: An IDA Round Table.

DTIC Science & Technology

1995-09-01

strong commitment today, as in the past, is that of metrology —the science and technology of measurement. Metrology has applications in the areas of...problem- solving approach: NIST has earned a worldwide reputation for impartiality and techni- cal excellence. Its competencies in metrology —the science... metrological development5 NIST’s evaluations of industry’s technology needs indicate widespread demand for enhanced measurement capabilities, and

A European Roadmap for Thermophysical Properties Metrology

NASA Astrophysics Data System (ADS)

Filtz, J.-R.; Wu, J.; Stacey, C.; Hollandt, J.; Monte, C.; Hay, B.; Hameury, J.; Villamañan, M. A.; Thurzo-Andras, E.; Sarge, S.

2015-03-01

A roadmap for thermophysical properties metrology was developed in spring 2011 by the Thermophysical Properties Working Group in the EURAMET Technical Committee in charge of Thermometry, Humidity and Moisture, and Thermophysical Properties metrology. This roadmapping process is part of the EURAMET (European Association of National Metrology Institutes) activities aiming to increase impact from national investment in European metrology R&D. The roadmap shows a shared vision of how the development of thermophysical properties metrology should be oriented over the next 15 years to meet future social and economic needs. Since thermophysical properties metrology is a very broad and varied field, the authors have limited this roadmap to the following families of properties: thermal transport properties (thermal conductivity, thermal diffusivity, etc.), radiative properties (emissivity, absorbance, reflectance, and transmittance), caloric quantities (specific heat, enthalpy, etc.), thermodynamic properties (PVT and phase equilibria properties), and temperature-dependent quantities (thermal expansion, compressibility, etc.). This roadmap identifies the main societal and economical triggers that drive developments in thermophysical properties metrology. The key topics considered are energy, environment, advanced manufacturing and processing, public safety, security, and health. Key targets that require improved thermophysical properties measurements are identified in order to address these triggers. Ways are also proposed for defining the necessary skills and the main useful means to be implemented. These proposals will have to be revised as needs and technologies evolve in the future.

Industrial graphene metrology.

PubMed

Kyle, Jennifer Reiber; Ozkan, Cengiz S; Ozkan, Mihrimah

2012-07-07

Graphene is an allotrope of carbon whose structure is based on one-atom-thick planar sheets of carbon atoms that are densely packed in a honeycomb crystal lattice. Its unique electrical and optical properties raised worldwide interest towards the design and fabrication of future electronic and optical devices with unmatched performance. At the moment, extensive efforts are underway to evaluate the reliability and performance of a number of such devices. With the recent advances in synthesizing large-area graphene sheets, engineers have begun investigating viable methodologies for conducting graphene metrology and quality control at industrial scales to understand a variety of reliability issues including defects, patternability, electrical, and physical properties. This review summarizes the current state of industrial graphene metrology and provides an overview of graphene metrology techniques. In addition, a recently developed large-area graphene metrology technique based on fluorescence quenching is introduced. For each metrology technique, the industrial metrics it measures are identified--layer thickness, edge structure, defects, Fermi level, and thermal conductivity--and a detailed description is provided as to how the measurements are performed. Additionally, the potential advantages of each technique for industrial use are identified, including throughput, scalability, sensitivity to substrate/environment, and on their demonstrated ability to achieve quantified results. The recently developed fluorescence-quenching metrology technique is shown to meet all the necessary criteria for industrial applications, rendering it the first industry-ready graphene metrology technique.

20 °C—A Short History of the Standard Reference Temperature for Industrial Dimensional Measurements

PubMed Central

Doiron, Ted

2007-01-01

One of the basic principles of dimensional metrology is that a part dimension changes with temperature because of thermal expansion. Since 1931 industrial lengths have been defined as the size at 20 °C. This paper discusses the variety of standard temperatures that were in use before that date, the efforts of C.E. Johansson to meet these variations, and the effort by the National Bureau of Standards to bring the United States to the eventual world standard. PMID:27110451

Ultraviolet Radiation Dose National Standard of México

NASA Astrophysics Data System (ADS)

Cardoso, R.; Rosas, E.

2006-09-01

We present the Ultraviolet (UV) Radiation Dose National Standard for México. The establishment of this measurement reference at Centro Nacional de Metrología (CENAM) eliminates the need of contacting foreign suppliers in the search for traceability towards the SI units when calibrating instruments at 365 nm. Further more, the UV Radiation Dose National Standard constitutes a highly accurate and reliable source for the UV radiation dose measurements performed in medical and cosmetic treatments as in the the food and pharmaceutics disinfection processes, among other.

High Accuracy Verification of a Correlated-Photon-Based Method for Determining Photon-Counting Detection Efficiency

DTIC Science & Technology

2007-01-01

Metrology; (270.5290) Photon statistics. References and links 1. W. H. Louisell, A. Yariv, and A. E. Siegman , “Quantum Fluctuations and Noise in...939–941 (1981). 7. S. R. Bowman, Y. H. Shih, and C. O. Alley, “The use of Geiger mode avalanche photodiodes for precise laser ranging at very low...light levels: An experimental evaluation”, in Laser Radar Technology and Applications I, James M. Cruickshank, Robert C. Harney eds., Proc. SPIE 663

Long working distance interference microscope

DOEpatents

Sinclair, Michael B.; DeBoer, Maarten P.; Smith, Norman F.

2004-04-13

Disclosed is a long working distance interference microscope suitable for three-dimensional imaging and metrology of MEMS devices and test structures on a standard microelectronics probe station. The long working distance of 10-30 mm allows standard probes or probe cards to be used. This enables nanometer-scale 3-D height profiles of MEMS test structures to be acquired across an entire wafer. A well-matched pair of reference/sample objectives is not required, significantly reducing the cost of this microscope, as compared to a Linnik microinterferometer.

CD-SEM metrology and OPC modeling for 2D patterning in advanced technology nodes (Conference Presentation)

NASA Astrophysics Data System (ADS)

Wallow, Thomas I.; Zhang, Chen; Fumar-Pici, Anita; Chen, Jun; Laenens, Bart; Spence, Christopher A.; Rio, David; van Adrichem, Paul; Dillen, Harm; Wang, Jing; Yang, Peng-Cheng; Gillijns, Werner; Jaenen, Patrick; van Roey, Frieda; van de Kerkhove, Jeroen; Babin, Sergey

2017-03-01

In the course of assessing OPC compact modeling capabilities and future requirements, we chose to investigate the interface between CD-SEM metrology methods and OPC modeling in some detail. Two linked observations motivated our study: 1) OPC modeling is, in principle, agnostic of metrology methods and best practice implementation. 2) Metrology teams across the industry use a wide variety of equipment, hardware settings, and image/data analysis methods to generate the large volumes of CD-SEM measurement data that are required for OPC in advanced technology nodes. Initial analyses led to the conclusion that many independent best practice metrology choices based on systematic study as well as accumulated institutional knowledge and experience can be reasonably made. Furthermore, these choices can result in substantial variations in measurement of otherwise identical model calibration and verification patterns. We will describe several experimental 2D test cases (i.e., metal, via/cut layers) that examine how systematic changes in metrology practice impact both the metrology data itself and the resulting full chip compact model behavior. Assessment of specific methodology choices will include: • CD-SEM hardware configurations and settings: these may range from SEM beam conditions (voltage, current, etc.,) to magnification, to frame integration optimizations that balance signal-to-noise vs. resist damage. • Image and measurement optimization: these may include choice of smoothing filters for noise suppression, threshold settings, etc. • Pattern measurement methodologies: these may include sampling strategies, CD- and contour- based approaches, and various strategies to optimize the measurement of complex 2D shapes. In addition, we will present conceptual frameworks and experimental methods that allow practitioners of OPC metrology to assess impacts of metrology best practice choices on model behavior. Finally, we will also assess requirements posed by node scaling on OPC model accuracy, and evaluate potential consequences for CD-SEM metrology capabilities and practices.

Dynamic-gravimetric preparation of metrologically traceable primary calibration standards for halogenated greenhouse gases

NASA Astrophysics Data System (ADS)

Guillevic, Myriam; Vollmer, Martin K.; Wyss, Simon A.; Leuenberger, Daiana; Ackermann, Andreas; Pascale, Céline; Niederhauser, Bernhard; Reimann, Stefan

2018-06-01

For many years, the comparability of measurements obtained with various instruments within a global-scale air quality monitoring network has been ensured by anchoring all results to a unique suite of reference gas mixtures, also called a primary calibration scale. Such suites of reference gas mixtures are usually prepared and then stored over decades in pressurised cylinders by a designated laboratory. For the halogenated gases which have been measured over the last 40 years, this anchoring method is highly relevant as measurement reproducibility is currently much better ( < 1 %, k = 2 or 95 % confidence interval) than the expanded uncertainty of a reference gas mixture (usually > 2 %). Meanwhile, newly emitted halogenated gases are already measured in the atmosphere at pmol mol-1 levels, while still lacking an established reference standard. For compounds prone to adsorption on material surfaces, it is difficult to evaluate mixture stability and thus variations in the molar fractions over time in cylinders at pmol mol-1 levels.To support atmospheric monitoring of halogenated gases, we create new primary calibration scales for SF6 (sulfur hexafluoride), HFC-125 (pentafluoroethane), HFO-1234yf (or HFC-1234yf, 2,3,3,3-tetrafluoroprop-1-ene), HCFC-132b (1,2-dichloro-1,1-difluoroethane) and CFC-13 (chlorotrifluoromethane). The preparation method, newly applied to halocarbons, is dynamic and gravimetric: it is based on the permeation principle followed by dynamic dilution and cryo-filling of the mixture in cylinders. The obtained METAS-2017 primary calibration scales are made of 11 cylinders containing these five substances at near-ambient and slightly varying molar fractions. Each prepared molar fraction is traceable to the realisation of SI units (International System of Units) and is assigned an uncertainty estimate following international guidelines (JCGM, 2008), ranging from 0.6 % for SF6 to 1.3 % (k = 2) for all other substances. The smallest uncertainty obtained for SF6 is mostly explained by the high substance purity level in the permeator and the low SF6 contamination of the matrix gas. The measured internal consistency of the suite ranges from 0.23 % for SF6 to 1.1 % for HFO-1234yf (k = 1). The expanded uncertainty after verification (i.e. measurement of the cylinders vs. each others) ranges from 1 to 2 % (k = 2).This work combines the advantages of SI-traceable reference gas mixture preparation with a calibration scale system for its use as anchor by a monitoring network. Such a combined system supports maximising compatibility within the network while linking all reference values to the SI and assigning carefully estimated uncertainties.For SF6, comparison of the METAS-2017 calibration scale with the scale prepared by SIO (Scripps Institution of Oceanography, SIO-05) shows excellent concordance, the ratio METAS-2017 / SIO-05 being 1.002. For HFC-125, the METAS-2017 calibration scale is measured as 7 % lower than SIO-14; for HFO-1234yf, it is 9 % lower than Empa-2013. No other scale for HCFC-132b was available for comparison. Finally, for CFC-13 the METAS-2017 primary calibration scale is 5 % higher than the interim calibration scale (Interim-98) that was in use within the Advanced Global Atmospheric Gases Experiment (AGAGE) network before adopting the scale established in the present work.

Legal Time of the Republic of Colombia and its international traceability using the Cesium Atomic Clock - Time and Frequency National Standard

NASA Astrophysics Data System (ADS)

Hernández Forero, Liz Catherine; Bahamón Cortés, Nelson

2017-06-01

Around the world, there are different providers of timestamp (mobile, radio or television operators, satellites of the GPS network, astronomical measurements, etc.), however, the source of the legal time for a country is either the national metrology institute or another designated laboratory. This activity requires a time standard based on an atomic time scale. The International Bureau of Weights and Measures (BIPM) calculates a weighted average of the time kept in more than 60 nations and produces a single international time scale, called Coordinated Universal Time (UTC). This article presents the current time scale that generates Legal Time for the Republic of Colombia produced by the Instituto Nacional de Metrología (INM) using the time and frequency national standard, a cesium atomic oscillator. It also illustrates how important it is for the academic, scientific and industrial communities, as well as the general public, to be synchronized with this time scale, which is traceable to the International System (SI) of units, through international comparisons that are made in real time.

Image-based metrology of porous tissue engineering scaffolds

NASA Astrophysics Data System (ADS)

Rajagopalan, Srinivasan; Robb, Richard A.

2006-03-01

Tissue engineering is an interdisciplinary effort aimed at the repair and regeneration of biological tissues through the application and control of cells, porous scaffolds and growth factors. The regeneration of specific tissues guided by tissue analogous substrates is dependent on diverse scaffold architectural indices that can be derived quantitatively from the microCT and microMR images of the scaffolds. However, the randomness of pore-solid distributions in conventional stochastic scaffolds presents unique computational challenges. As a result, image-based characterization of scaffolds has been predominantly qualitative. In this paper, we discuss quantitative image-based techniques that can be used to compute the metrological indices of porous tissue engineering scaffolds. While bulk averaged quantities such as porosity and surface are derived directly from the optimal pore-solid delineations, the spatially distributed geometric indices are derived from the medial axis representations of the pore network. The computational framework proposed (to the best of our knowledge for the first time in tissue engineering) in this paper might have profound implications towards unraveling the symbiotic structure-function relationship of porous tissue engineering scaffolds.

Electro-Optical Inspection For Tolerance Control As An Integral Part Of A Flexible Machining Cell

NASA Astrophysics Data System (ADS)

Renaud, Blaise

1986-11-01

Institut CERAC has been involved in optical metrology and 3-dimensional surface control for the last couple of years. Among the industrial applications considered is the on-line shape evaluation of machined parts within the manufacturing cell. The specific objective is to measure the machining errors and to compare them with the tolerances set by designers. An electro-optical sensing technique has been developed which relies on a projection Moire contouring optical method. A prototype inspection system has been designed, making use of video detection and computer image processing. Moire interferograms are interpreted, and the metrological information automatically retrieved. A structured database can be generated for subsequent data analysis and for real-time closed-loop corrective actions. A real-time kernel embedded into a synchronisation network (Petri-net) for the control of concurrent processes in the Electra-Optical Inspection (E0I) station was realised and implemented in a MODULA-2 program DIN01. The prototype system for on-line automatic tolerance control taking place within a flexible machining cell is described in this paper, together with the fast-prototype synchronisation program.

Spectroscopic metrology for isotope composition measurements and transfer standards

NASA Astrophysics Data System (ADS)

Anyangwe Nwaboh, Javis; Balslev-Harder, David; Kääriäinen, Teemu; Richmond, Craig; Manninen, Albert; Mohn, Joachim; Kiseleva, Maria; Petersen, Jan C.; Werhahn, Olav; Ebert, Volker

2017-04-01

The World Meteorological Organization (WMO) has identified greenhouse gases such as CO2, CH4 and N2O as critical for global climate monitoring. Other molecules such as CO that has an indirect effect of enhancing global warming are also monitored. WMO has stated compatibility goals for atmospheric concentration and isotope ratio measurements of these gases, e.g. 0.1 ppm for CO2 concentration measurements in the northern hemisphere and 0.01 ‰ for δ13C-CO2. For measurements of the concentration of greenhouse gases, gas analysers are typically calibrated with static gas standards e.g. traceable to the WMO scale or to the International System of Units (SI) through a national metrology institute. However, concentrations of target components, e.g. CO, in static gas standards have been observed to drift, and typically the gas matrix as well as the isotopic composition of the target component does not always reflect field gas composition, leading to deviations of the analyser response, even after calibration. The deviations are dependent on the measurement technique. To address this issue, part of the HIGHGAS (Metrology for high-impact greenhouse gases) project [1] focused on the development of optical transfer standards (OTSs) for greenhouse gases, e.g. CO2 and CO, potentially complementing gas standards. Isotope ratio mass spectrometry (IRMS) [2] is currently used to provide state-of-the-art high precision (in the 0.01 ‰ range) measurements for the isotopic composition of greenhouse gases. However, there is a need for field-deployable techniques such as optical isotope ratio spectroscopy (OIRS) that can be combined with metrological measurement methods. Within the HIGHGAS project, OIRS methods and procedures based on e.g. cavity enhanced spectroscopy (CES) and tunable diode laser absorption spectroscopy (TDLAS), matched to metrological principles have been established for the measurement of 13C/12C and 18O/16O ratios in CO2, 15N/14N ratios in N2O, and 13C/12C and 2H/1H ratios in CH4. Here, based on HIGHGAS project results, we present OTSs for atmospheric CO2 and CO measurements. The results delivered by the OTSs are in excellent agreement with gravimetric values of metrological "primary" static gas standards. The repeatabilities of the OTS results are matching the compatibility goals stated by WMO for atmospheric CO2 and CO measurements. In addition, we present OIRS measurement methods and procedures to demonstrate their applicability and validation. The requirements on, e.g. absorption line data quality and temperature sensitivity of isotope ratio, are discussed. Uncertainty budgets are presented and the traceability of the results is addressed. The current limitations in our measurements are discussed and steps taken to address these limitations are presented. Acknowledgement Parts of this work have been carried out within the European Metrology Research Programme (EMRP) ENV52 project-HIGHGAS. The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union. References [1] EMRP project ENV52-HIGHGAS, available at: http://www.euramet.org/ [2] Prosenjit Ghosh, Willi A. Brand, International Journal of Mass Spectrometry 228, 1-33 (2003).

Search for general relativistic effects in table-top displacement metrology

NASA Technical Reports Server (NTRS)

Halverson, Peter G.; Macdonald, Daniel R.; Diaz, Rosemary T.

2004-01-01

As displacement metrology accuracy improves, general relativistic effects will become noticeable. Metrology gauges developed for the Space Interferometry Mission were used to search for locally anisotropic space-time, with a null result at the 10 to the negative tenth power level.

Test Evaluation and Modification of Prototype Rotating Gravity Gradiometer

DTIC Science & Technology

1975-07-01

RECOMMENEATIONS 3 4.0 BEARINGS 6 4.1 Design 6 4.2 Metrology 6 4.3 Preassembly 14 5.0 TEST RIG 17 5.1 Design 17 5.2 Metrology 21 5.3 Assembly and...print requirements of 5 \\i inches TIR max. However, because of available (stare-of-the-art) metrology equipment limitations, no conclusion as to...gravity gradiometer are contained in Shaker Research Corporation drawing series 101 (see Appendix I), 4.2 Metrology The production of the

education | News

Science.gov Websites

, agencies and professional associations. Introduction to metrology career day at St. Charles North High St. Charles North High School students to talk with them about metrology. Here, use a portable , a Fermilab metrology technical specialist, visited St. Charles North High School students to talk

Search for general relativistic effects in table-top displacement metrology

NASA Technical Reports Server (NTRS)

Halverson, Peter G.; Diaz, Rosemary T.; Macdonald, Daniel R.

2004-01-01

As displacement metrology accuracy improves, general relativistic effects will become noticeable. Metrology gauges developed for the Space Interferometry Mission, were used to search for locally anisotropic space-time, with a null result at the 10 to the negative 10th power level.

Metrology for the manufacturing of freeform optics

NASA Astrophysics Data System (ADS)

Blalock, Todd; Myer, Brian; Ferralli, Ian; Brunelle, Matt; Lynch, Tim

2017-10-01

Recently the use of freeform surfaces have become a realization for optical designers. These non-symmetrical optical surfaces have allowed unique solutions to optical design problems. The implementation of freeform optical surfaces has been limited by manufacturing capabilities and quality. However over the past several years freeform fabrication processes have improved in capability and precision. But as with any manufacturing, proper metrology is required to monitor and verify the process. Typical optics metrology such as interferometry has its challenges and limitations with the unique shapes of freeform optics. Two contact metrology methods for freeform metrology are presented; a Leitz coordinate measurement machine (CMM) with an uncertainty of +/- 0.5 μm and a high resolution profilometer (Panasonic UA3P) with a measurement uncertainty of +/- 0.05 μm. We are also developing a non-contact high resolution technique based on the fringe reflection technique known as deflectometry. This fast non-contact metrology has the potential to compete with accuracies of the contact methods but also can acquire data in seconds rather than minutes or hours.

Analysis of key technologies for virtual instruments metrology

NASA Astrophysics Data System (ADS)

Liu, Guixiong; Xu, Qingui; Gao, Furong; Guan, Qiuju; Fang, Qiang

2008-12-01

Virtual instruments (VIs) require metrological verification when applied as measuring instruments. Owing to the software-centered architecture, metrological evaluation of VIs includes two aspects: measurement functions and software characteristics. Complexity of software imposes difficulties on metrological testing of VIs. Key approaches and technologies for metrology evaluation of virtual instruments are investigated and analyzed in this paper. The principal issue is evaluation of measurement uncertainty. The nature and regularity of measurement uncertainty caused by software and algorithms can be evaluated by modeling, simulation, analysis, testing and statistics with support of powerful computing capability of PC. Another concern is evaluation of software features like correctness, reliability, stability, security and real-time of VIs. Technologies from software engineering, software testing and computer security domain can be used for these purposes. For example, a variety of black-box testing, white-box testing and modeling approaches can be used to evaluate the reliability of modules, components, applications and the whole VI software. The security of a VI can be assessed by methods like vulnerability scanning and penetration analysis. In order to facilitate metrology institutions to perform metrological verification of VIs efficiently, an automatic metrological tool for the above validation is essential. Based on technologies of numerical simulation, software testing and system benchmarking, a framework for the automatic tool is proposed in this paper. Investigation on implementation of existing automatic tools that perform calculation of measurement uncertainty, software testing and security assessment demonstrates the feasibility of the automatic framework advanced.

A micro-CMM with metrology frame for low uncertainty measurements

NASA Astrophysics Data System (ADS)

Brand, Uwe; Kirchhoff, Juergen

2005-12-01

A conventional bridge-type coordinate measuring machine (CMM) with an opto-tactile fibre probe for the measurement of microstructures has been equipped with a metrology frame in order to reduce its measurement uncertainty. The frame contains six laser interferometers for high-precision position and guiding deviation measurements, a Zerodur cuboid with three measuring surfaces for the laser interferometers to which the fibre probe is fixed, and an invar frame which supports the measuring objects and to which the reference mirrors of the interferometers are fixed. The orthogonality and flatness deviations of the Zerodur measuring surfaces have been measured and taken into account in the equation of motion of the probing sphere. As a first performance test, the flatness of an optical flat has been measured with the fibre probe. Measuring-depth-dependent and probing-force-dependent shifts of the probing position were observed. In order to reduce the scattering of the probing points, 77 measurements were averaged for one coordinate point to be measured. This has led to measuring times of several hours for one plane and strong thermal drifts of the measured probing points.

Final report of supplementary comparison AFRIMETS.AUV.A-S1: primary pressure calibration of LS2aP microphones according to IEC 61094-2, over the frequency range 1 Hz to 31.5 kHz.

NASA Astrophysics Data System (ADS)

Nel, R.; Barrera-Figueroa, S.; Dobrowolska, D.; Defilippo Soares, Z. M.; Maina, A. K.; Hof, C.

2016-01-01

This is the final report of the AFRIMETS.AUV-S1 comparison of the pressure sensitivity, modulus and phase, of LS2aP microphones in the frequency range 1 Hz to 31.5 kHz in accordance with IEC 61094-2. Six national metrology institutes from three different regional metrology organisations participated in the comparison for which two LS2aP microphones were circulated simultaneously to all the participants in a hybrid-star configuration. The comparison reference values were calculated as the weighted mean for modulus and phase for each individual microphone. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCAUV, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Features calibration of the dynamic force transducers

NASA Astrophysics Data System (ADS)

Sc., M. Yu Prilepko D.; Lysenko, V. G.

2018-04-01

The article discusses calibration methods of dynamic forces measuring instruments. The relevance of work is dictated by need to valid definition of the dynamic forces transducers metrological characteristics taking into account their intended application. The aim of this work is choice justification of calibration method, which provides the definition dynamic forces transducers metrological characteristics under simulation operating conditions for determining suitability for using in accordance with its purpose. The following tasks are solved: the mathematical model and the main measurements equation of calibration dynamic forces transducers by load weight, the main budget uncertainty components of calibration are defined. The new method of dynamic forces transducers calibration with use the reference converter “force-deformation” based on the calibrated elastic element and measurement of his deformation by a laser interferometer is offered. The mathematical model and the main measurements equation of the offered method is constructed. It is shown that use of calibration method based on measurements by the laser interferometer of calibrated elastic element deformations allows to exclude or to considerably reduce the uncertainty budget components inherent to method of load weight.

Airborne hygrometer calibration inter-comparison against a metrological water vapour standard

NASA Astrophysics Data System (ADS)

Smorgon, Denis; Boese, Norbert; Ebert, Volker

2014-05-01

Water vapour is the most important atmospheric greenhouse gas, which causes a major feedback to warming and other changes in the climate system. Knowledge of the distribution of water vapour and its climate induced changes is especially important in the upper troposphere and lower stratosphere (UT/LS) where vapour plays a critical role in atmospheric radiative balance, cirrus cloud formation, and photochemistry. But, our understanding of water in the UT/LS is limited by significant uncertainties in current UT/LS water measurements. One of the most comprehensive inter-comparison campaigns for airborne hygrometers, termed AQUAVIT (AV1) [1], took place in 2007 at the AIDA chamber at the Karlsruhe Institute of Technology (KIT) in Germany. AV1 was a well-defined, referred, blind inter-comparison of 22 airborne field instruments from 17 international research groups. One major metrological deficit of AV1, however, was, that no traceable reference instrument participated in the inter-comparison experiments and that the calibration procedures of the participating instruments were not monitored or interrogated. Consequently a follow-up inter-comparison was organized in April 2013, which for the first time also provides a traceable link to the international humidity scale. This AQUAVIT2 (AV2) campaign (details see: http://www.imk-aaf.kit.edu/aquavit/index.php/Main_Page) was again located at KIT/AIDA and organised by an international organizing committee including KIT, PTB, FZJ and others. Generally AV2 is divided in two parallel comparisons: 1) AV2-A uses the AIDA chamber for a simultaneous comparison of all instruments (incl. sampling and in-situ instruments) over a broad range of conditions characteristic for the UT/LS; 2) AV2-B, about which this paper is reporting, is a sequential comparison of selected hygrometers and (when possible) their reference calibration infrastructures by means of a chilled mirror hygrometer traced back to the primary National humidity standard of PTB and a validated, two-pressure generator acting as a highly stable and reproducible source of water vapour. The aim of AV2-B was to perform an absolute, metrological comparison of the field instruments/calibration infrastructures to the metrological humidity scale, and to collect essential information about methods and procedures used by the atmospheric community for instrument calibration and validation, in order to investigate e.g. the necessity and possible comparability advantage by a standardized calibration procedure. The work will give an overview over the concept of the AV2-B inter-comparison, the various general measurement and calibration principles, and discuss the outcome and consequences of the comparison effort. The AQUAVIT effort is linked to the EMRP project METEOMET (ENV07) and partially supported by the EMRP and ENV07. The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union. [1] H. Saathoff, C. Schiller, V. Ebert, D. W. Fahey, R.-S. Gao, O. Möhler, and the aquavit team, The AQUAVIT formal intercomparison of atmospheric water measurement methods, 5th General Assembly of the European Geosciences Union, 13-18 April 2008, Vienna, Austria Keywords: humidity, water vapour, inter-comparison, airborne instruments.

Issues of Teaching Metrology in Higher Education Institutions of Civil Engineering in Russia

ERIC Educational Resources Information Center

Pukharenko, Yurii Vladimirovich; Norin, Veniamin Aleksandrovich

2017-01-01

The work analyses the training process condition in teaching the discipline "Metrology, Standardization, Certification and Quality Control." It proves that the current educational standard regarding the instruction of the discipline "Metrology, Standardization, Certification and Quality Control" does not meet the needs of the…

Metrology Careers: Jobs for Good Measure

ERIC Educational Resources Information Center

Liming, Drew

2009-01-01

What kind of career rewards precision and accuracy? One in metrology--the science of measurement. By evaluating and calibrating the technology in people's everyday lives, metrologists keep their world running smoothly. Metrology is used in the design and production of almost everything people encounter daily, from the cell phones in their pockets…

Adjustment method for embedded metrology engine in an EM773 series microcontroller.

PubMed

Blazinšek, Iztok; Kotnik, Bojan; Chowdhury, Amor; Kačič, Zdravko

2015-09-01

This paper presents the problems of implementation and adjustment (calibration) of a metrology engine embedded in NXP's EM773 series microcontroller. The metrology engine is used in a smart metering application to collect data about energy utilization and is controlled with the use of metrology engine adjustment (calibration) parameters. The aim of this research is to develop a method which would enable the operators to find and verify the optimum parameters which would ensure the best possible accuracy. Properly adjusted (calibrated) metrology engines can then be used as a base for variety of products used in smart and intelligent environments. This paper focuses on the problems encountered in the development, partial automatisation, implementation and verification of this method. Copyright © 2015 ISA. Published by Elsevier Ltd. All rights reserved.

The European Comparison of Absolute Gravimeters 2011 (ECAG-2011) in Walferdange, Luxembourg: results and recommendations

NASA Astrophysics Data System (ADS)

Francis, Olivier; Baumann, Henri; Volarik, Tomas; Rothleitner, Christian; Klein, Gilbert; Seil, Marc; Dando, Nicolas; Tracey, Ray; Ullrich, Christian; Castelein, Stefaan; Hua, Hu; Kang, Wu; Chongyang, Shen; Songbo, Xuan; Hongbo, Tan; Zhengyuan, Li; Pálinkás, Vojtech; Kostelecký, Jakub; Mäkinen, Jaakko; Näränen, Jyri; Merlet, Sébastien; Farah, Tristan; Guerlin, Christine; Pereira Dos Santos, Franck; Le Moigne, Nicolas; Champollion, Cédric; Deville, Sabrina; Timmen, Ludger; Falk, Reinhard; Wilmes, Herbert; Iacovone, Domenico; Baccaro, Francesco; Germak, Alessandro; Biolcati, Emanuele; Krynski, Jan; Sekowski, Marcin; Olszak, Tomasz; Pachuta, Andrzej; Agren, Jonas; Engfeldt, Andreas; Reudink, René; Inacio, Pedro; McLaughlin, Daniel; Shannon, Geoff; Eckl, Marc; Wilkins, Tim; van Westrum, Derek; Billson, Ryan

2013-06-01

We present the results of the third European Comparison of Absolute Gravimeters held in Walferdange, Grand Duchy of Luxembourg, in November 2011. Twenty-two gravimeters from both metrological and non-metrological institutes are compared. For the first time, corrections for the laser beam diffraction and the self-attraction of the gravimeters are implemented. The gravity observations are also corrected for geophysical gravity changes that occurred during the comparison using the observations of a superconducting gravimeter. We show that these corrections improve the degree of equivalence between the gravimeters. We present the results for two different combinations of data. In the first one, we use only the observations from the metrological institutes. In the second solution, we include all the data from both metrological and non-metrological institutes. Those solutions are then compared with the official result of the comparison published previously and based on the observations of the metrological institutes and the gravity differences at the different sites as measured by non-metrological institutes. Overall, the absolute gravity meters agree with one another with a standard deviation of 3.1 µGal. Finally, the results of this comparison are linked to previous ones. We conclude with some important recommendations for future comparisons.

High accuracy Primary Reference gas Mixtures for high-impact greenhouse gases

NASA Astrophysics Data System (ADS)

Nieuwenkamp, Gerard; Zalewska, Ewelina; Pearce-Hill, Ruth; Brewer, Paul; Resner, Kate; Mace, Tatiana; Tarhan, Tanil; Zellweger, Christophe; Mohn, Joachim

2017-04-01

Climate change, due to increased man-made emissions of greenhouse gases, poses one of the greatest risks to society worldwide. High-impact greenhouse gases (CO2, CH4 and N2O) and indirect drivers for global warming (e.g. CO) are measured by the global monitoring stations for greenhouse gases, operated and organized by the World Meteorological Organization (WMO). Reference gases for the calibration of analyzers have to meet very challenging low level of measurement uncertainty to comply with the Data Quality Objectives (DQOs) set by the WMO. Within the framework of the European Metrology Research Programme (EMRP), a project to improve the metrology for high-impact greenhouse gases was granted (HIGHGAS, June 2014-May 2017). As a result of the HIGHGAS project, primary reference gas mixtures in cylinders for ambient levels of CO2, CH4, N2O and CO in air have been prepared with unprecedented low uncertainties, typically 3-10 times lower than usually previously achieved by the NMIs. To accomplish these low uncertainties in the reference standards, a number of preparation and analysis steps have been studied and improved. The purity analysis of the parent gases had to be performed with lower detection limits than previously achievable. E.g., to achieve an uncertainty of 2•10-9 mol/mol (absolute) on the amount fraction for N2O, the detection limit for the N2O analysis in the parent gases has to be in the sub nmol/mol domain. Results of an OPO-CRDS analyzer set-up in the 5µm wavelength domain, with a 200•10-12 mol/mol detection limit for N2O, will be presented. The adsorption effects of greenhouse gas components at cylinder surfaces are critical, and have been studied for different cylinder passivation techniques. Results of a two-year stability study will be presented. The fit-for-purpose of the reference materials was studied for possible variation on isotopic composition between the reference material and the sample. Measurement results for a suit of CO2 in air mixtures with varying δ13C values (from -5‰ to -40‰) analyzed with both cavity ringdown spectroscopy (CRDS) and isotope-ratio mass spectrometry (IRMS) will be presented. Round robins were organized to assess the agreement of the new reference gas mixtures developed by different project partners and to compare the new reference gases with the reference standards currently used by the atmospheric monitoring community (NOAA and AGAGE). These results will also be presented.

Automation of wear analysis for large caliber weapons

NASA Astrophysics Data System (ADS)

Salafia, Dominick; DeLeon, Norberto L.; Outlaw, James F.

1999-12-01

As part of the Test and Evaluation Command (TECOM) the Metrology and Simulation Division (MT-MS) at the U.S. Army Yuma Proving Ground (USAYPG) has the mission to measure and record the wear effects of conventional and experimental munitions on large caliber weapons. The primary objective is to ensure that the weapon to be fired will safely meet the mission requirements for the quantity and energy of the munitions under live fire testing. Currently, there are two criteria used to "deadline" a weapon. One is the actual physical wear tolerance. The other relates to the energy (zone) expended by the round and the subsequent fatigue induced in the microstructure of the gun tube. The latter is referred to as the Equivalent Full Charge (EFC) for the particular round. In order to maximize safety and reduce the time required to manually search records for the appropriate level of useful life, the Measurements and Simulation Branch of MT-MS at USAYPG has made use of the installation network such that critical information may be accessed from the local area network or the Internet. An electronic database has been constructed and the query routines have been written so that systems test personnel, test directors (TD), and other government organizations may conduct a search for a particular weapon. The user may enter specifications such as percent physical life, percent EFC life, caliber, model, modifications, and serial number or any combination thereof. This paper is intended to inform the engineering and scientific community, engaged in weapons performance evaluation using simulations and field testing, of the existence of wear analysis automation for large caliber weapons.

Air kerma and absorbed dose standards for reference dosimetry in brachytherapy

PubMed Central

2014-01-01

This article reviews recent developments in primary standards for the calibration of brachytherapy sources, with an emphasis on the currently most common photon-emitting radionuclides. The introduction discusses the need for reference dosimetry in brachytherapy in general. The following section focuses on the three main quantities, i.e. reference air kerma rate, air kerma strength and absorbed dose rate to water, which are currently used for the specification of brachytherapy photon sources and which can be realized with primary standards from first principles. An overview of different air kerma and absorbed dose standards, which have been independently developed by various national metrology institutes over the past two decades, is given in the next two sections. Other dosimetry techniques for brachytherapy will also be discussed. The review closes with an outlook on a possible transition from air kerma to absorbed dose to water-based calibrations for brachytherapy sources in the future. PMID:24814696

Progress toward Brazilian cesium fountain second generation

NASA Astrophysics Data System (ADS)

Bueno, Caio; Rodriguez Salas, Andrés; Torres Müller, Stella; Bagnato, Vanderlei Salvador; Varela Magalhães, Daniel

2018-03-01

The operation of a Cesium fountain primary frequency standard is strongly influenced by the characteristics of two important subsystems. The first is a stable frequency reference and the second is the frequency-transfer system. A stable standard frequency reference is key factor for experiments that require high accuracy and precision. The frequency stability of this reference has a significant impact on the procedures for evaluating certain systematic biases in frequency standards. This paper presents the second generation of the Brazilian Cesium Fountain (Br-CsF) through the opto-mechanical assembly and vacuum chamber to trap atoms. We used a squared section glass profile to build the region where the atoms are trapped and colled by magneto-optical technique. The opto-mechanical system was reduced to increase stability and robustness. This newest Atomic Fountain is essential to contribute with time and frequency development in metrology systems.

The role of standards in the development and implementation of clinical laboratory tests: a domestic and global perspective.

PubMed

Michaud, Ginette Y

2005-01-01

In the field of clinical laboratory medicine, standardization is aimed at increasing the trueness and reliability of measured values. Standardization relies on the use of written standards, reference measurement procedures and reference materials. These are important tools for the design and validation of new tests, and for establishing the metrological traceability of diagnostic assays. Their use supports the translation of research technologies into new diagnostic assays and leads to more rapid advances in science and medicine, as well as improvements in the quality of patient care. The various standardization tools are described, as are the procedures by which written standards, reference procedures and reference materials are developed. Recent efforts to develop standards for use in the field of molecular diagnostics are discussed. The recognition of standardization tools by the FDA and other regulatory authorities is noted as evidence of their important role in ensuring the safety and performance of in vitro diagnostic devices.

Range-Gated Metrology: An Ultra-Compact Sensor for Dimensional Stabilization

NASA Technical Reports Server (NTRS)

Lay, Oliver P.; Dubovitsky, Serge; Shaddock, Daniel A.; Ware, Brent; Woodruff, Christopher S.

2008-01-01

Point-to-point laser metrology systems can be used to stabilize large structures at the nanometer levels required for precision optical systems. Existing sensors are large and intrusive, however, with optical heads that consist of several optical elements and require multiple optical fiber connections. The use of point-to-point laser metrology has therefore been limited to applications where only a few gauges are needed and there is sufficient space to accommodate them. Range-Gated Metrology is a signal processing technique that preserves nanometer-level or better performance while enabling: (1) a greatly simplified optical head - a single fiber optic collimator - that can be made very compact, and (2) a single optical fiber connection that is readily multiplexed. This combination of features means that it will be straightforward and cost-effective to embed tens or hundreds of compact metrology gauges to stabilize a large structure. In this paper we describe the concept behind Range-Gated Metrology, demonstrate the performance in a laboratory environment, and give examples of how such a sensor system might be deployed.

The Development of a Deflectometer for Accurate Surface Figure Metrology

NASA Technical Reports Server (NTRS)

Gubarev, Mikhail; Eberhardt, Andrew; Ramsey, Brian; Atkins, Carolyn

2015-01-01

Marshall Space Flight Center is developing the method of direct fabrication for high resolution full-shell x-ray optics. In this technique the x-ray optics axial profiles are figured and polished using a computer-controlled ZeekoIRP600X polishing machine. Based on the Chandra optics fabrication history about one third of the manufacturing time is spent on moving a mirror between fabrication and metrology sites, reinstallation and alignment with either the metrology or fabrication instruments. Also, the accuracy of the alignment significantly affects the ultimate accuracy of the resulting mirrors. In order to achieve higher convergence rate it is highly desirable to have a metrology technique capable of in situ surface figure measurements of the optics under fabrication, so the overall fabrication costs would be greatly reduced while removing the surface errors due to the re-alignment necessary after each metrology cycle during the fabrication. The goal of this feasibility study is to demonstrate if the Phase Measuring Deflectometry can be applied for in situ metrology of full shell x-ray optics. Examples of the full-shell mirror substrates suitable for the direct fabrication

Measurement of in-plane displacements using the phase singularities generated by directional wavelet transforms of speckle pattern images.

PubMed

Vadnjal, Ana Laura; Etchepareborda, Pablo; Federico, Alejandro; Kaufmann, Guillermo H

2013-03-20

We present a method to determine micro and nano in-plane displacements based on the phase singularities generated by application of directional wavelet transforms to speckle pattern images. The spatial distribution of the obtained phase singularities by the wavelet transform configures a network, which is characterized by two quasi-orthogonal directions. The displacement value is determined by identifying the intersection points of the network before and after the displacement produced by the tested object. The performance of this method is evaluated using simulated speckle patterns and experimental data. The proposed approach is compared with the optical vortex metrology and digital image correlation methods in terms of performance and noise robustness, and the advantages and limitations associated to each method are also discussed.

Coordinate metrology using scanning probe microscopes

NASA Astrophysics Data System (ADS)

Marinello, F.; Savio, E.; Bariani, P.; Carmignato, S.

2009-08-01

New positioning, probing and measuring strategies in coordinate metrology are needed for the accomplishment of true three-dimensional characterization of microstructures, with uncertainties in the nanometre range. In the present work, the implementation of scanning probe microscopes (SPMs) as systems for coordinate metrology is discussed. A new non-raster measurement approach is proposed, where the probe is moved to sense points along free paths on the sample surface, with no loss of accuracy with respect to traditional raster scanning and scan time reduction. Furthermore, new probes featuring long tips with innovative geometries suitable for coordinate metrology through SPMs are examined and reported.

Surface Wave Metrology for Copper/Low-k Interconnects

NASA Astrophysics Data System (ADS)

Gostein, M.; Maznev, A. A.; Mazurenko, A.; Tower, J.

2005-09-01

We review recent advances in the application of laser-induced surface acoustic wave metrology to issues in copper/low-k interconnect development and manufacturing. We illustrate how the metrology technique can be used to measure copper thickness uniformity on a range of features from solid pads to arrays of lines, focusing on specific processing issues in copper electrochemical deposition (ECD) and chemical-mechanical polishing (CMP). In addition, we review recent developments in surface wave metrology for the characterization of low-k dielectric elastic modulus, including the ability to measure within-wafer uniformity of elastic modulus and to characterize porous, anisotropic films.

Enhanced resolution and accuracy of freeform metrology through Subaperture Stitching Interferometry

NASA Astrophysics Data System (ADS)

Supranowitz, Chris; Maloney, Chris; Murphy, Paul; Dumas, Paul

2017-10-01

Recent advances in polishing and metrology have addressed many of the challenges in the fabrication and metrology of freeform surfaces, and the manufacture of these surfaces is possible today. However, achieving the form and mid-spatial frequency (MSF) specifications that are typical of visible imaging systems remains a challenge. Interferometric metrology for freeform surfaces is thus highly desirable for such applications, but the capability is currently quite limited for freeforms. In this paper, we provide preliminary results that demonstrate accurate, high-resolution measurements of freeform surfaces using prototype software on QED's ASI™ (Aspheric Stitching Interferometer).

Multiscale information modelling for heart morphogenesis

NASA Astrophysics Data System (ADS)

Abdulla, T.; Imms, R.; Schleich, J. M.; Summers, R.

2010-07-01

Science is made feasible by the adoption of common systems of units. As research has become more data intensive, especially in the biomedical domain, it requires the adoption of a common system of information models, to make explicit the relationship between one set of data and another, regardless of format. This is being realised through the OBO Foundry to develop a suite of reference ontologies, and NCBO Bioportal to provide services to integrate biomedical resources and functionality to visualise and create mappings between ontology terms. Biomedical experts tend to be focused at one level of spatial scale, be it biochemistry, cell biology, or anatomy. Likewise, the ontologies they use tend to be focused at a particular level of scale. There is increasing interest in a multiscale systems approach, which attempts to integrate between different levels of scale to gain understanding of emergent effects. This is a return to physiological medicine with a computational emphasis, exemplified by the worldwide Physiome initiative, and the European Union funded Network of Excellence in the Virtual Physiological Human. However, little work has been done on how information modelling itself may be tailored to a multiscale systems approach. We demonstrate how this can be done for the complex process of heart morphogenesis, which requires multiscale understanding in both time and spatial domains. Such an effort enables the integration of multiscale metrology.

Metrology for Information Technology

DTIC Science & Technology

1997-05-01

Technology (IT) MEL/ITL Task Group on Metrology for Information Technology (IT) U.S. DEPARTMENT OF COMMERCE Technology Administration National Institute of...NIST management requested a white paper on metrology for information technology (IT). A task group was formed to develop this white paper with...representatives from the Manufacturing Engineering Laboratory (MEL), the Information Technology Laboratory (ITL), and Technology Services (TS). The task

A spectroscopic transfer standard for accurate atmospheric CO measurements

NASA Astrophysics Data System (ADS)

Nwaboh, Javis A.; Li, Gang; Serdyukov, Anton; Werhahn, Olav; Ebert, Volker

2016-04-01

Atmospheric carbon monoxide (CO) is a precursor of essential climate variables and has an indirect effect for enhancing global warming. Accurate and reliable measurements of atmospheric CO concentration are becoming indispensable. WMO-GAW reports states a compatibility goal of ±2 ppb for atmospheric CO concentration measurements. Therefore, the EMRP-HIGHGAS (European metrology research program - high-impact greenhouse gases) project aims at developing spectroscopic transfer standards for CO concentration measurements to meet this goal. A spectroscopic transfer standard would provide results that are directly traceable to the SI, can be very useful for calibration of devices operating in the field, and could complement classical gas standards in the field where calibration gas mixtures in bottles often are not accurate, available or stable enough [1][2]. Here, we present our new direct tunable diode laser absorption spectroscopy (dTDLAS) sensor capable of performing absolute ("calibration free") CO concentration measurements, and being operated as a spectroscopic transfer standard. To achieve the compatibility goal stated by WMO for CO concentration measurements and ensure the traceability of the final concentration results, traceable spectral line data especially line intensities with appropriate uncertainties are needed. Therefore, we utilize our new high-resolution Fourier-transform infrared (FTIR) spectroscopy CO line data for the 2-0 band, with significantly reduced uncertainties, for the dTDLAS data evaluation. Further, we demonstrate the capability of our sensor for atmospheric CO measurements, discuss uncertainty calculation following the guide to the expression of uncertainty in measurement (GUM) principles and show that CO concentrations derived using the sensor, based on the TILSAM (traceable infrared laser spectroscopic amount fraction measurement) method, are in excellent agreement with gravimetric values. Acknowledgement Parts of this work have been carried out within the European Metrology Research Programme (EMRP) ENV52 project-HIGHGAS (Metrology for high-impact greenhouse gases). The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union. References [1] EMRP project ENV52-HIGHGAS (Metrology for high-impact greenhouse gases), available at: http://www.euramet.org/. [2] J. Nwaboh, A. Manninen, J. Mohn, J. C. Petersen, O. Werhahn, and V.Ebert, European Geosciences Union General Assembly 2015, EGU2015-13542, 2015, Vienna Austria

The need for LWR metrology standardization: the imec roughness protocol

NASA Astrophysics Data System (ADS)

Lorusso, Gian Francesco; Sutani, Takumichi; Rutigliani, Vito; van Roey, Frieda; Moussa, Alain; Charley, Anne-Laure; Mack, Chris; Naulleau, Patrick; Constantoudis, Vassilios; Ikota, Masami; Ishimoto, Toru; Koshihara, Shunsuke

2018-03-01

As semiconductor technology keeps moving forward, undeterred by the many challenges ahead, one specific deliverable is capturing the attention of many experts in the field: Line Width Roughness (LWR) specifications are expected to be less than 2nm in the near term, and to drop below 1nm in just a few years. This is a daunting challenge and engineers throughout the industry are trying to meet these targets using every means at their disposal. However, although current efforts are surely admirable, we believe they are not enough. The fact is that a specification has a meaning only if there is an agreed methodology to verify if the criterion is met or not. Such a standardization is critical in any field of science and technology and the question that we need to ask ourselves today is whether we have a standardized LWR metrology or not. In other words, if a single reference sample were provided, would everyone measuring it get reasonably comparable results? We came to realize that this is not the case and that the observed spread in the results throughout the industry is quite large. In our opinion, this makes the comparison of LWR data among institutions, or to a specification, very difficult. In this paper, we report the spread of measured LWR data across the semiconductor industry. We investigate the impact of image acquisition, measurement algorithm, and frequency analysis parameters on LWR metrology. We review critically some of the International Technology Roadmap for Semiconductors (ITRS) metrology guidelines (such as measurement box length larger than 2μm and the need to correct for SEM noise). We compare the SEM roughness results to AFM measurements. Finally, we propose a standardized LWR measurement protocol - the imec Roughness Protocol (iRP) - intended to ensure that every time LWR measurements are compared (from various sources or to specifications), the comparison is sensible and sound. We deeply believe that the industry is at a point where it is imperative to guarantee that when talking about a critical parameter such like LWR, everyone speaks the same language, which is not currently the case.

Characterization of potassium dichromate solutions for spectrophotometercalibration

NASA Astrophysics Data System (ADS)

Conceição, F. C.; Silva, E. M.; Gomes, J. F. S.; Borges, P. P.

2018-03-01

Spectrophotometric analysis in the ultraviolet (UV) region is used in the determination of several quantitative and qualitative parameters. For ensuring reliability of the analyses performed on the spectrophotometers, verification / calibration of the equipment must be performed periodically using certified reference materials (CRMs). This work presents the characterization stage needed for producing this CRM. The property value characterized was the absorbance for the wavelengths in the UV spectral regions. This CRM will contribute to guarantee the accuracy and linearity of the absorbance scale to the spectrophotometers, through which analytical measurement results will be provided with metrological traceability.

Comparison of digital signal processing modules in gamma-ray spectrometry.

PubMed

Lépy, Marie-Christine; Cissé, Ousmane Ibrahima; Pierre, Sylvie

2014-05-01

Commercial digital signal-processing modules have been tested for their applicability to gamma-ray spectrometry. The tests were based on the same n-type high purity germanium detector. The spectrum quality was studied in terms of energy resolution and peak area versus shaping parameters, using a Eu-152 point source. The stability of a reference peak count rate versus the total count rate was also examined. The reliability of the quantitative results is discussed for their use in measurement at the metrological level. © 2013 Published by Elsevier Ltd.

Software for imaging phase-shift interference microscope

NASA Astrophysics Data System (ADS)

Malinovski, I.; França, R. S.; Couceiro, I. B.

2018-03-01

In recent years absolute interference microscope was created at National Metrology Institute of Brazil (INMETRO). The instrument by principle of operation is imaging phase-shifting interferometer (PSI) equipped with two stabilized lasers of different colour as traceable reference wavelength sources. We report here some progress in development of the software for this instrument. The status of undergoing internal validation and verification of the software is also reported. In contrast with standard PSI method, different methodology of phase evaluation is applied. Therefore, instrument specific procedures for software validation and verification are adapted and discussed.

Optical Frequency Synthesizer for Precision Spectroscopy

NASA Astrophysics Data System (ADS)

Holzwarth, R.; Udem, Th.; Hänsch, T. W.; Knight, J. C.; Wadsworth, W. J.; Russell, P. St. J.

2000-09-01

We have used the frequency comb generated by a femtosecond mode-locked laser and broadened to more than an optical octave in a photonic crystal fiber to realize a frequency chain that links a 10 MHz radio frequency reference phase-coherently in one step to the optical region. By comparison with a similar frequency chain we set an upper limit for the uncertainty of this new approach to 5.1×10-16. This opens the door for measurement and synthesis of virtually any optical frequency and is ready to revolutionize frequency metrology.

On the benefit of high resolution and low aberrations for in-die mask registration metrology

NASA Astrophysics Data System (ADS)

Beyer, Dirk; Seidel, Dirk; Heisig, Sven; Steinert, Steffen; Töpfer, Susanne; Scherübl, Thomas; Hetzler, Jochen

2014-10-01

With the introduction of complex lithography schemes like double and multi - patterning and new design principles like gridded designs with cut masks the requirements for mask to mask overlay have increased dramatically. Still, there are some good news too for the mask industry since more mask are needed and qualified. Although always confronted with throughput demands, latest writing tool developments are able to keep pace with ever increasing pattern placement specs not only for global signatures but for in-die features within the active area. Placement specs less than 3nm (max. 3 Sigma) are expected and needed in all cases in order to keep the mask contribution to the overall overlay budget at an accepted level. The qualification of these masks relies on high precision metrology tools which have to fulfill stringent metrology as well as resolution constrains at the same time. Furthermore, multi-patterning and gridded designs with pinhole type cut masks are drivers for a paradigm shift in registration metrology from classical registration crosses to in-die registration metrology on production features. These requirements result in several challenges for registration metrology tools. The resolution of the system must be sufficiently high to resolve small production features. At the same time tighter repeatability is required. Furthermore, tool induced shift (TIS) limit the accuracy of in-die measurements. This paper discusses and demonstrates the importance of low illumination wavelength together with low aberrations for best contrast imaging for in-die registration metrology. Typical effects like tool induced shift are analyzed and evaluated using the ZEISS PROVE® registration metrology tool. Additionally, we will address performance gains when going to higher resolution. The direct impact on repeatability for small features by registration measurements will be discussed as well.

Next generation of decision making software for nanopatterns characterization: application to semiconductor industry

NASA Astrophysics Data System (ADS)

Dervilllé, A.; Labrosse, A.; Zimmermann, Y.; Foucher, J.; Gronheid, R.; Boeckx, C.; Singh, A.; Leray, P.; Halder, S.

2016-03-01

The dimensional scaling in IC manufacturing strongly drives the demands on CD and defect metrology techniques and their measurement uncertainties. Defect review has become as important as CD metrology and both of them create a new metrology paradigm because it creates a completely new need for flexible, robust and scalable metrology software. Current, software architectures and metrology algorithms are performant but it must be pushed to another higher level in order to follow roadmap speed and requirements. For example: manage defect and CD in one step algorithm, customize algorithms and outputs features for each R&D team environment, provide software update every day or every week for R&D teams in order to explore easily various development strategies. The final goal is to avoid spending hours and days to manually tune algorithm to analyze metrology data and to allow R&D teams to stay focus on their expertise. The benefits are drastic costs reduction, more efficient R&D team and better process quality. In this paper, we propose a new generation of software platform and development infrastructure which can integrate specific metrology business modules. For example, we will show the integration of a chemistry module dedicated to electronics materials like Direct Self Assembly features. We will show a new generation of image analysis algorithms which are able to manage at the same time defect rates, images classifications, CD and roughness measurements with high throughput performances in order to be compatible with HVM. In a second part, we will assess the reliability, the customization of algorithm and the software platform capabilities to follow new specific semiconductor metrology software requirements: flexibility, robustness, high throughput and scalability. Finally, we will demonstrate how such environment has allowed a drastic reduction of data analysis cycle time.

State of the art stationary and mobile infrastructure for the dynamic generation and dilution of traceable reference gas mixtures of Ammonia at ambient air amount fractions

NASA Astrophysics Data System (ADS)

Leuenberger, Daiana; Pascale, Céline; Guillevic, Myriam; Ackermann, Andreas; Niederhauser, Bernhard

2017-04-01

Ammonia (NH3) in the atmosphere is the major precursor for neutralising atmospheric acids and is thus affecting not only the long-range transport of sulphur dioxide and nitrogen oxides but also stabilises secondary particulate matter. These aerosols have negative impacts on air quality and human health. Moreover, they negatively affect terrestrial ecosystems after deposition. NH3 has been included in the air quality monitoring networks and emission reduction directives of European nations. Atmospheric concentrations are in the order of 0.5-500 nmol/mol. However, the lowest substance amount fraction of available certified reference material (CRM) is 10 μmol/mol. This due to the fact that adsorption on the walls of aluminium cylinders and desorption as pressure in the cylinder decreases cause substantial instabilities in the amount fractions of the gas mixtures. Moreover, analytical techniques to be calibrated are very diverse and cause challenges for the production and application of CRM. The Federal Institute of Metrology METAS has developed, partially in the framework of EMRP JRP ENV55 MetNH3, an infrastructure to meet with the different requirements in order to generate SI-traceable NH3 reference gas mixtures dynamically in the amount fraction range 0.5-500 nmol/mol and with uncertainties UNH3 <3%. The infrastructure consists of a stationary as well as a mobile device for full flexibility in the application: In the stationary system, a magnetic suspension balance monitors the specific temperature and pressure dependent mass loss over time of the pure substance in a permeation tube (here NH3) by permeation through a membrane into a constant flow of carrier gas. Subsequently, this mixture is diluted with a system of thermal mass flow controllers in one or two consecutive steps to desired amount fractions. The permeation tube with calibrated permeation rate (mass loss over time previously determined in the magnetic suspension balance) can be transferred into the temperature-regulated permeation chamber of a newly developed mobile reference gas generator (ReGaS1). In addition to the permeation chamber it consists of the same dilution system as afore mentioned, stationary system. All components are fully traceable to SI standards. Considerable effort has been made to minimise adsorption on the gas-wetted stainless steel surfaces and thus to reduce stabilisation times by applying the SilcoNert2000® coating substance. Analysers can be connected directly to both, stationary and mobile systems for calibration. Moreover, the resulting gas mixture can also be pressurised into coated cylinders by cryo-filling. The mobile system as well as these cylinders can be applied for calibrations in other laboratories and in the field. In addition, an SI traceable system based on a cascade of critical orifices has been established to dilute NH3 mixtures in the order of μmol/mol stored in cylinders for the participation in the international key-comparison CCQM K117. It is planned to establish this system to calibrate and re-sample gas cylinders due to its very economical gas use. Here we present insights into the development of said infrastructure and results of the first performance tests. Moreover, we include results of the study on adsorption/desorption effects in dry as well as humidified matrix gas into the discussion on the generation of reference gas mixtures. Acknowledgement: This work was supported by the European Metrology Research Programme (EMRP). The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union.

Book Review:

NASA Astrophysics Data System (ADS)

Hudson, R. P.

1981-04-01

In July 1976, some thirty young scientists and their lecturers were privileged to participate in a conference on "Metrology and the Fundamental Constants" at Varenna, this being the 68th course in the "Enrico Fermi International School of Physics". Now, at last, we are all privileged to share in that experience—to a large degree—with the appearance of the Proceedings, published last summer under the auspices of the Italian Physical Society. This rather massive volume (800 pages) places in one's hands a summary of the "state of the art" in the greater part of physical metrology. It is not, however, a metrology handbook, designed to assist the unskilled in making trustworthy measurements. It summarizes, via the lectures of internationally-recognized experts, the most recent attempts to realize with enhanced accuracy the basic units of measurement and, in so doing, it presents the subject of measurement science as the central (or all-pervasive) topic in physics itself. Clearly demonstrated is the progress from discovery to "understanding" of physical phenomena which is made possible through the historical alternation of observation and measurement. The volume includes informative reviews of the fundamentals of this fundamental science, namely, the concepts of quantities and units (Allisy); systems of units and the Système International, SI. (Terrien); international aspects of metrology and standards (Terrien); practical considerations in a hierarchy of standards (Terrien); materials problems affecting metrology (Ferro Milone and Sourdo) and statistical methods (Allisy). These discussions alone, being brought together in one place, are of particular usefulness. The remaining, and major, part of the book is taken up by authoritative and generally very readable discussions of measurement topics, for the most part separately focused on one of the base units. For these one cannot help noticing nor refrain from recording a measure of imbalance: some quantities (for example, time and frequency) are accorded several lectures and lecturers, while most receive only one each. That choice by the conference's organizers is not explained in the Foreword. But it is not a very serious drawback; nor—for the anglophone reader, at least—is the appearance here and there of quaint inventions in English which, in fact, add to the charm. There are short articles on the Determination of Atomic Masses of Nuclides (Wapstra), some Problems in Photometry (Korte); two by A Bray on Force Standards, one dealing with Dissemination and the other with Measurement of "g"; Time Scales (Leschiutta); determining the Volume of a Sphere (Terrien); and two by Giacomo, one commenting on Mass Measurements and one discussing the Speed of Light. Of intermediate length are reviews of the Determination of Best Values of the Fundamental Physical Constants (Cohen); Length Measurement Standards (Giacomo), and Topics in Quantum Electrodynamics (Combley and Picasso). The extended treatment of time and frequency metrology includes three major articles by Audoin: a general (largely analytical) one on Frequency Metrology, followed by detailed discussions of Cesium Beam and Hydrogen Maser technology. There are, in addition, specialized treatments of Optically-Pumped Microwave Devices (Arditi) and of Optical Frequency Standards (i.e., lasers) by Chebotayev; finally, a brief note by De Marchi on Problems in Frequency Synthesis in the far Infrared Region. A long article by Petley covers the many-faceted subject of Electrical Metrology and the Fundamental Constants. Equally variegated, although belied by its simple title, is a discussion of Thermometry by Quinn. And last, but not least, is a detailed account by Deslattes of his determination of Avogadro's Constant which ranges over the topics of Infrared to Gamma-ray Reference Wavelengths, Mass and Density. In summarizing it is difficult to avoid the assertion, however hackneyed, that no physicist can afford to be without—or, at least, do without reading—a copy of these Proceedings.

EDITORIAL: Nanoscale metrology Nanoscale metrology

NASA Astrophysics Data System (ADS)

Klapetek, P.; Koenders, L.

2011-09-01

This special issue of Measurement Science and Technology presents selected contributions from the NanoScale 2010 seminar held in Brno, Czech Republic. It was the 5th Seminar on Nanoscale Calibration Standards and Methods and the 9th Seminar on Quantitative Microscopy (the first being held in 1995). The seminar was jointly organized with the Czech Metrology Institute (CMI) and the Nanometrology Group of the Technical Committee-Length of EURAMET. There were two workshops that were integrated into NanoScale 2010: first a workshop presenting the results obtained in NANOTRACE, a European Metrology Research Project (EMRP) on displacement-measuring optical interferometers, and second a workshop about the European metrology landscape in nanometrology related to thin films, scanning probe microscopy and critical dimension. The aim of this workshop was to bring together developers, applicants and metrologists working in this field of nanometrology and to discuss future needs. For more information see www.co-nanomet.eu. The articles in this special issue of Measurement Science and Technology cover some novel scientific results. This issue can serve also as a representative selection of topics that are currently being investigated in the field of European and world-wide nanometrology. Besides traditional topics of dimensional metrology, like development of novel interferometers or laser stabilization techniques, some novel interesting trends in the field of nanometrology are observed. As metrology generally reflects the needs of scientific and industrial research, many research topics addressed refer to current trends in nanotechnology, too, focusing on traceability and improved measurement accuracy in this field. While historically the most studied standards in nanometrology were related to simple geometric structures like step heights or 1D or 2D gratings, now we are facing tasks to measure 3D structures and many unforeseen questions arising from interesting physical properties of nanoparticles, nanotubes, quantum dots and similar fascinating objects. Currently there is a high level of interest in characterization of nanoparticles since they are increasingly encountered in science, technology, life sciences and even everyday life. Quantitative characterization of nanoparticles has been the subject of many discussions and some recent work over the last couple of years, and both scanning probe microscopy and scanning or transmission electron microscopy characterization of nanoparticles are presented here. There is also a continuous need for improvement of scanning probe microscopy that is a basic tool for nanometrology. Increasing thermal stability, scanning speed and tip stability, improving traceability and reducing uncertainty are all areas being addressed. As scanning probe microscopy is essentially based on force measurements in the nano- and piconewton range, we take notice of large developments, both theoretical and experimental, in the field of traceable measurements of nanoscale forces. This will greatly increase the understanding and quantification of many basic phenomena in scanning probe microscopy. Finally, we observe that high resolution techniques for acquiring more than just morphology are slowly shifting from purely qualitative tools to well defined quantitative methods. Lack of simple and reliable chemical identification in scanning probe microscopy is compensated by many other local probing methods seen in commercial microscopes, like scanning thermal microscopy or the Kelvin probe technique. All these methods still require underpinning with theoretical and experimental work before they can become traceable analytical methods; however, the increased interest in the metrology community gives rise to optimism in this field. The production of this issue involved considerable effort from many contributors. We would like to thank all the authors for their contributions, the referees for their time spent reviewing the contributions and their valuable comments, and the whole Editorial Board of Measurement Science and Technology for their support.

The Austrian absolute gravity base net: 27 years of spatial and temporal acquisition of gravity data

NASA Astrophysics Data System (ADS)

Ullrich, Christian; Ruess, Diethard

2014-05-01

Since 1987 the BEV (Federal Office of Metrology and Surveying) has been operating the absolute gravimeters JILAg-6 and FG5 which are used for basic measurements to determine or review fundamental gravity stations in Austria and abroad. Overall more than 70 absolute gravity stations were installed in Austria and neighbouring countries and some of them have been regularly monitored. A few stations are part of international projects like ECGN (European Combined Geodetic network) and UNIGRACE (Unification of Gravity System in Central and Eastern Europe). As a national metrology institute (NMI) the Metrology Service of the BEV maintains the national standards for the realisation of the legal units of measurement and ensures their international equivalence and recognition. Thus the BEV maintains the national standard for gravimetry in Austria, which is validated and confirmed by international comparisons. Since 1989 the Austrian absolute gravimeters participated seven times in the ICAG's (International Comparison of Absolute Gravimeters) at the BIPM in Paris and Luxemburg and as well participated three times at the ECAG (European Comparison of Absolute Gravimeters) in Luxemburg. The results of these ICAG's and especially the performance of the Austrian absolute gravimeter are reported in this presentation. We also present some examples and interpretation of long time monitoring stations of absolute gravity in several Austrian locations. Some stations are located in large cities like Vienna and Graz and some others are situated in mountainous regions. Mountain stations are at the Conrad Observatory where a SG (Superconducting Gravimeter) is permanently monitoring and in Obergurgl (Tyrolia) at an elevation of approx. 2000 m which is very strong influenced from the glacier retreat.

Development of a strontium optical lattice clock for space applications

NASA Astrophysics Data System (ADS)

Singh, Yeshpal

2016-07-01

With timekeeping being of paramount importance for modern life, much research and major scientific advances have been undertaken in the field of frequency metrology, particularly over the last few years. New Nobel-prize winning technologies have enabled a new era of atomic clocks; namely the optical clock. These have been shown to perform significantly better than the best microwave clocks reaching an inaccuracy of 1.6x10-18 [1]. With such results being found in large lab based apparatus, the focus now has shifted to portability - to enable the accuracy of various ground based clocks to be measured, and compact autonomous performance - to enable such technologies to be tested in space. This could lead to a master clock in space, improving not only the accuracy of technologies on which modern life has come to require such as GPS and communication networks. But also more fundamentally, this could lead to the redefinition of the second and tests of fundamental physics including applications in the fields of ground based and satellite geodesy, metrology, positioning, navigation, transport and logistics etc. Within the European collaboration, Space Optical Clocks (SOC2) [2-3] consisting of various institutes and industry partners across Europe we have tried to tackle this problem of miniaturisation whilst maintaining stability, accuracy (5x10-17) and robustness whilst keeping power consumption to a minimum - necessary for space applications. We will present the most recent results of the Sr optical clock in SOC2 and also the novel compact design features, new methods employed and outlook. References [1] B. J. Bloom, T. L. Nicholson, J. R. Williams, S. L. Campbell, M. Bishof, X. Zhang, W. Zhang, S. L. Bromley, and J. Ye, "An optical lattice clock with accuracy and stability at the 10-18 level," Nature 506, 71-75 (2014). [2] S. Schiller et al. "Towards Neutral-atom Space Optical Clocks (SOC2): Development of high-performance transportable and breadboard optical clocks and advanced subsystems" on "Let's embrace space, volume II" 45, 452-463 (2012). ISBN 978-92-79-22207-8. [3] www.soc2.eu

Manufacturing Laboratory for Next Generation Engineers

DTIC Science & Technology

2013-12-16

automated CNC machines, rapid prototype systems, robotic assembly systems, metrology , and non-traditional systems such as a waterjet cutter, EDM machine...CNC machines, rapid prototype systems, robotic assembly systems, metrology , and non-traditional systems such as a waterjet cutter, EDM machine, plasma...System Metrology and Quality Control Equipment - This area already had a CMM and other well known quality control instrumentation. It has been enhanced

Emerging technology for astronomical optics metrology

NASA Astrophysics Data System (ADS)

Trumper, Isaac; Jannuzi, Buell T.; Kim, Dae Wook

2018-05-01

Next generation astronomical optics will enable science discoveries across all fields and impact the way we perceive the Universe in which we live. To build these systems, optical metrology tools have been developed that push the boundary of what is possible. We present a summary of a few key metrology technologies that we believe are critical for the coming generation of optical surfaces.

IT Security Standards and Legal Metrology - Transfer and Validation

NASA Astrophysics Data System (ADS)

Thiel, F.; Hartmann, V.; Grottker, U.; Richter, D.

2014-08-01

Legal Metrology's requirements can be transferred into the IT security domain applying a generic set of standardized rules provided by the Common Criteria (ISO/IEC 15408). We will outline the transfer and cross validation of such an approach. As an example serves the integration of Legal Metrology's requirements into a recently developed Common Criteria based Protection Profile for a Smart Meter Gateway designed under the leadership of the Germany's Federal Office for Information Security. The requirements on utility meters laid down in the Measuring Instruments Directive (MID) are incorporated. A verification approach to check for meeting Legal Metrology's requirements by their interpretation through Common Criteria's generic requirements is also presented.

Forensic Metrology: Its Importance and Evolution in the United States

NASA Astrophysics Data System (ADS)

Vosk, JD Ted

2016-11-01

Forensic measurements play a significant role in the U.S. criminal justice system. Guilt or innocence, or the severity of a sentence, may depend upon the results of such measurements. Until recently, however, forensic disciplines were largely unaware of the field of metrology. Accordingly, proper measurement practices were often, and widely, neglected. These include failure to adopt proper calibration techniques, establish the traceability of results and determine measurement uncertainty. These failures undermine confidence in verdicts based upon forensic measurements. Over the past decade, though, the forensic sciences have been introduced to metrology and its principles leading to more reliable measurement practices. The impetus for this change was driven by many forces. Pressure came initially from criminal defense lawyers challenging metrologically unsound practices and results relied upon by government prosecutions. Litigation in the State of Washington led this movement spurring action by attorneys in other jurisdictions and eventually reform in the measurement practices of forensic labs around the country. Since then, the greater scientific community, other forensic scientists and even prosecutors have joined the fight. This paper describes the fight to improve the quality of justice by the application of metrological principles and the evolution of the field of forensic metrology.

Single-ion, transportable optical atomic clocks

NASA Astrophysics Data System (ADS)

Delehaye, Marion; Lacroûte, Clément

2018-03-01

For the past 15 years, tremendous progress within the fields of laser stabilization, optical frequency combs and atom cooling and trapping have allowed the realization of optical atomic clocks with unrivaled performances. These instruments can perform frequency comparisons with fractional uncertainties well below ?, finding applications in fundamental physics tests, relativistic geodesy and time and frequency metrology. Even though most optical clocks are currently laboratory setups, several proposals for using these clocks for field measurements or within an optical clock network have been published, and most of time and frequency metrology institutes have started to develop transportable optical clocks. For the purpose of this special issue, we chose to focus on trapped-ion optical clocks. Even though their short-term fractional frequency stability is impaired by a lower signal-to-noise ratio, they offer a high potential for compactness: trapped ions demand low optical powers and simple loading schemes, and can be trapped in small vacuum chambers. We review recent advances on the clock key components, including ion trap and ultra-stable optical cavity, as well as existing projects and experiments which draw the picture of what future transportable, single-ion optical clocks may resemble.

PREFACE: 3rd International Congress on Mechanical Metrology (CIMMEC2014)

NASA Astrophysics Data System (ADS)

2015-10-01

From October 14th to 16th 2014, The Brazilian National Institute of Metrology, Quality, and Technology (Inmetro) and the Brazilian Society of Metrology (SBM) organized the 3rd International Congress on Mechanical Metrology (3rd CIMMEC). The 3rd CIMMEC was held in the city of Gramado, Rio Grande do Sul, Brazil. Anticipating the interest and enthusiasm of the technical-scientific community, the Organizing Institutions invite people and organizations to participate in this important congress, reiterating the commitment to organize an event according to highest international standards. This event has been conceived to integrate people and organizations from Brazil and abroad in the discussion of advanced themes in metrology. Manufacturers and dealers of measuring equipment and standards, as well as of auxiliary accessories and bibliographic material, had the chance to promote their products and services in stands at the Fair, which has taken place alongside the Congress. The 3rd CIMMEC consisted of five Keynote Speeches and 116 regular papers. Among the regular papers, the 25 most outstanding ones, comprising a high quality content on Mechanical Metrology, were selected to be published in this issue of Journal of Physics: Conference Series. It is our great pleasure to present this volume of Journal of Physics: Conference Series to the scientific community to promote further research in Mechanical Metrology and related areas. We believe that this volume will be both an excellent source of scientific material in the fast evolving fields that were covered by CIMMEC 2014.

Implementation and performance of the metrology system for the multi-object optical and near-infrared spectrograph MOONS

NASA Astrophysics Data System (ADS)

Drass, Holger; Vanzi, Leonardo; Torres-Torriti, Miguel; Dünner, Rolando; Shen, Tzu-Chiang; Belmar, Francisco; Dauvin, Lousie; Staig, Tomás.; Antognini, Jonathan; Flores, Mauricio; Luco, Yerko; Béchet, Clémentine; Boettger, David; Beard, Steven; Montgomery, David; Watson, Stephen; Cabral, Alexandre; Hayati, Mahmoud; Abreu, Manuel; Rees, Phil; Cirasuolo, Michele; Taylor, William; Fairley, Alasdair

2016-08-01

The Multi-Object Optical and Near-infrared Spectrograph (MOONS) will cover the Very Large Telescope's (VLT) field of view with 1000 fibres. The fibres will be mounted on fibre positioning units (FPU) implemented as two-DOF robot arms to ensure a homogeneous coverage of the 500 square arcmin field of view. To accurately and fast determine the position of the 1000 fibres a metrology system has been designed. This paper presents the hardware and software design and performance of the metrology system. The metrology system is based on the analysis of images taken by a circular array of 12 cameras located close to the VLTs derotator ring around the Nasmyth focus. The system includes 24 individually adjustable lamps. The fibre positions are measured through dedicated metrology targets mounted on top of the FPUs and fiducial markers connected to the FPU support plate which are imaged at the same time. A flexible pipeline based on VLT standards is used to process the images. The position accuracy was determined to 5 μm in the central region of the images. Including the outer regions the overall positioning accuracy is 25 μm. The MOONS metrology system is fully set up with a working prototype. The results in parts of the images are already excellent. By using upcoming hardware and improving the calibration it is expected to fulfil the accuracy requirement over the complete field of view for all metrology cameras.

Assuring measurement quality in person-centred healthcare

NASA Astrophysics Data System (ADS)

Pendrill, L. R.

2018-03-01

Is it realistic to aspire to the same kind of quality-assurance of measurement in person-centred care, currently being implemented in healthcare globally, as is established in the physical sciences and engineering? Ensuring metrological comparability (‘traceability’) and reliably declaring measurement uncertainty when assessing patient ability or increased social capital are however challenging for subjective measurements often characterised by large dispersion. Drawing simple analogies between ‘instruments’ in the social sciences—questionnaires, ability tests, etc—and engineering instruments such as thermometers does not go far enough. A possible way forward, apparently equally applicable to both physical and social measurement, seems to be to model inferences in terms of performance metrics of a measurement system. Person-centred care needs person-centred measurement and a full picture of the measurement process when man acts as a measurement instrument is given in the present paper. This complements previous work by presenting the process, step by step, from the observed indication (e.g. probability of success, P success, of achieving a task), through restitution with Rasch measurement theory, to the measurand (e.g. task difficulty). Rasch invariant measure theory can yield quantities—‘latent’ (or ‘explanatory’) variables such as task challenge or person ability—with characteristics akin to those of physical quantities. Metrological references for comparability via traceability and reliable estimates of uncertainty and decision risks are then in reach even for perceptive measurements (and other qualitative properties). As a case study, the person-centred measurement of cognitive ability is examined, as part of the EU project EMPIR 15HLT04 NeuroMet, for Alzheimer’s, where better analysis of correlations with brain atrophy is enabled thanks to the Rasch metrological approach.

Bilateral Comparison Between NIM and NMC Over the Temperature Range from 83.8058 K to 692.677 K

NASA Astrophysics Data System (ADS)

Sun, Jianping; Ye, Shaochun; Kho, Haoyuan; Zhang, Jintao; Wang, Li

2015-08-01

A bilateral comparison of local realization of the International Temperature Scale of 1990 between the National Institute of Metrology (NIM) and National Metrology Centre (NMC) was carried out over the temperature range from 83.8058 K to 692.677 K. It involved six fixed points including the argon triple point, the mercury triple point, the triple point of water, the melting point of gallium, the freezing point of tin, and the freezing point of zinc. In 2009, NMC asked NIM to participate in a bilateral comparison to link the NMC results to the Consultative Committee for Thermometry Key Comparison 3 (CCT-K3) and facilitate the NMC's calibration and measurement capabilities submission. This comparison was agreed by NIM and Asia Pacific Metrology Programme in 2009, and registered in the Key Comparison Database in 2010 as CCT-K3.2. NMC supplied two fused silica sheath standard platinum resistance thermometers (SPRTs) as traveling standards. One of them was used at the Ga, Sn, and Zn fixed points, while the other one was used at the Ar and Hg fixed points. NMC measured them before and after NIM measured them. During the comparison, a criterion for the SPRT was set as the stability at the triple point of water to be less than 0.3 mK. The results for both laboratories are summarized. A proposal for linking the NMC's comparison results to CCT-K3 is presented. The difference between NMC and NIM and the difference between NMC and the CCT-K3 average reference value using NIM as a link are reported with expanded uncertainties at each measured fixed point.

National Needs for Appearance Metrology

NASA Astrophysics Data System (ADS)

Nadal, Maria E.

2003-04-01

Appearance greatly influences a customer's judgement of the quality and acceptability of manufactured products, as yearly there is approximately $700 billion worth of shipped goods for which overall appearance is critical to their sale. For example, appearance is reported to be a major factor in about half of automobile purchases. The appearance of an object is the result of a complex interaction of the light field incident upon the object, the scattering and absorption properties of the object, and human perception. The measurable attributes of appearance are divided into color (hue, saturation, and lightness) and geometry (gloss, haze). The nature of the global economy has increased international competition and the need to improve the quality of many manufactured products. Since the manufacturing and marketing of these products is international in scope, the lack of national appearance standard artifacts and measurement protocols results in a direct loss to the supplier. One of the primary missions of the National Institute of Standards and Technology (NIST) is to strengthen the U.S. economy by working with industry to develop and apply technology, measurements and standards. The NIST Physics Laboratory has established an appearance metrology laboratory. This new laboratory provides calibration services for 0^o/45^o color standards and 20^o°, 60^o°, and 85^o° specular gloss, and research in the colorimetric characterization of gonioapparent including a new Standard Reference Material for metallic coatings (SRM 2017) and measurement protocols for pearlescent coatings. These services are NIST's first appearance metrology efforts in many years; a response to needs articulated by industry. These services are designed to meet demands for improved measurements and standards to enhance the acceptability of final products since appearance often plays a major role in their acceptability.

JPRS Report, Science & Technology, USSR: Science & Technology Policy

DTIC Science & Technology

1988-04-05

associa- tions—were formulated. Specialists, A. V. Glichev, direc- tor of the All-Union Institute of Metrology and Stan- dardization of the USSR State...Various functional subdi- visions—laboratories of reliability, metrological labora- tories, monitoring and diagnostic centers, and so forth— are...department for standards, metrology , and quality. The latter annually does not approve and sends back for modification up to 20 of the "notebooks of

Integrating Residual Stress Analysis of Critical Fastener Holes into USAF Depot Maintenance

DTIC Science & Technology

2014-11-02

40 Table 15. Metrology of the initial reamer, initial hole diameters, and resulting CX for the class/type hole combinations for Pattern 1...70 Table 16. Metrology of the initial reamer, initial hole diameters, and resulting...step in the cold work process. These procedures produce a digital documentation of the hole, based on critical metrology , which can be linked with

In-Process Metrology And Control Of Large Optical Grinders

NASA Astrophysics Data System (ADS)

Anderson, D. S.; Ketelsen, D.; Kittrell, W. Cary; Kuhn, Wm; Parks, R. E.; Stahl, P.

1987-01-01

The advent of rapid figure generation at the University of Arizona has prompted the development of rapid metrology techniques. The success and efficiency of the generating process is highly dependent on timely and accurate measurements to update the feedback loop between machine and optician. We will describe the advantages and problems associated with the in-process metrology and control systems used at the Optical Sciences Center.

Hybrid overlay metrology with CDSEM in a BEOL patterning scheme

NASA Astrophysics Data System (ADS)

Leray, Philippe; Jehoul, Christiane; Inoue, Osamu; Okagawa, Yutaka

2015-03-01

Overlay metrology accuracy is a major concern for our industry. Advanced logic process require more tighter overlay control for multipatterning schemes. TIS (Tool Induced Shift) and WIS (Wafer Induced Shift) are the main issues for IBO (Image Based Overlay) and DBO (Diffraction Based Overlay). Methods of compensation have been introduced, some are even very efficient to reduce these measured offsets. Another related question is about the overlay target designs. These targets are never fully representative of the design rules, strong efforts have been achieved, but the device cannot be completely duplicated. Ideally, we would like to measure in the device itself to verify the real overlay value. Top down CDSEM can measure critical dimensions of any structure, it is not dependent of specific target design. It can also measure the overlay errors but only in specific cases like LELE (Litho Etch Litho Etch) after final patterning. In this paper, we will revisit the capability of the CDSEM at final patterning by measuring overlay in dedicated targets as well as inside a logic and an SRAM design. In the dedicated overlay targets, we study the measurement differences between design rules gratings and relaxed pitch gratings. These relaxed pitch which are usually used in IBO or DBO targets. Beyond this "simple" LELE case, we will explore the capability of the CDSEM to measure overlay even if not at final patterning, at litho level. We will assess the hybridization of DBO and CDSEM for reference to optical tools after final patterning. We will show that these reference data can be used to validate the DBO overlay results (correctables and residual fingerprints).

Sensor fusion V; Proceedings of the Meeting, Boston, MA, Nov. 15-17, 1992

NASA Technical Reports Server (NTRS)

Schenker, Paul S. (Editor)

1992-01-01

Topics addressed include 3D object perception, human-machine interface in multisensor systems, sensor fusion architecture, fusion of multiple and distributed sensors, interface and decision models for sensor fusion, computational networks, simple sensing for complex action, multisensor-based control, and metrology and calibration of multisensor systems. Particular attention is given to controlling 3D objects by sketching 2D views, the graphical simulation and animation environment for flexible structure robots, designing robotic systems from sensorimotor modules, cylindrical object reconstruction from a sequence of images, an accurate estimation of surface properties by integrating information using Bayesian networks, an adaptive fusion model for a distributed detection system, multiple concurrent object descriptions in support of autonomous navigation, robot control with multiple sensors and heuristic knowledge, and optical array detectors for image sensors calibration. (No individual items are abstracted in this volume)

1998 Conference on Precision Electromagnetic Measurements Digest. Proceedings.

NASA Astrophysics Data System (ADS)

Nelson, T. L.

The following topics were dealt with: fundamental constants; caesium standards; AC-DC transfer; impedance measurement; length measurement; units; statistics; cryogenic resonators; time transfer; QED; resistance scaling and bridges; mass measurement; atomic fountains and clocks; single electron transport; Newtonian constant of gravitation; stabilised lasers and frequency measurements; cryogenic current comparators; optical frequency standards; high voltage devices and systems; international compatibility; magnetic measurement; precision power measurement; high resolution spectroscopy; DC transport standards; waveform acquisition and analysis; ion trap standards; optical metrology; quantised Hall effect; Josephson array comparisons; signal generation and measurement; Avogadro constant; microwave networks; wideband power standards; antennas, fields and EMC; quantum-based standards.

EDITORIAL: Metrological Aspects of Accelerator Technology and High Energy Physics Experiments

NASA Astrophysics Data System (ADS)

Romaniuk, Ryszard S.; Pozniak, Krzysztof T.

2007-08-01

The subject of this special feature in Measurement Science and Technology concerns measurement methods, devices and subsystems, both hardware and software aspects, applied in large experiments of high energy physics (HEP) and superconducting RF accelerator technology (SRF). These experiments concern mainly the physics of elementary particles or the building of new machines and detectors. The papers present practical examples of applied solutions in large, contemporary, international research projects such as HERA, LHC, FLASH, XFEL, ILC and others. These machines are unique in their global scale and consist of extremely dedicated apparatus. The apparatus is characterized by very large dimensions, a considerable use of resources and a high level of overall technical complexity. They possess a large number of measurement channels (ranging from thousands to over 100 million), are characterized by fast of processing of measured data and high measurement accuracies, and work in quite adverse environments. The measurement channels cooperate with a large number of different sensors of momenta, energies, trajectories of elementary particles, electron, proton and photon beam profiles, accelerating fields in resonant cavities, and many others. The provision of high quality measurement systems requires the designers to use only the most up-to-date technical solutions, measurement technologies, components and devices. Research work in these demanding fields is a natural birthplace of new measurement methods, new data processing and acquisition algorithms, complex, networked measurement system diagnostics and monitoring. These developments are taking place in both hardware and software layers. The chief intention of this special feature is that the papers represent equally some of the most current metrology research problems in HEP and SRF. The accepted papers have been divided into four topical groups: superconducting cavities (4 papers), low level RF systems (8 papers), ionizing radiation (5 papers) and HEP experiments (8 papers). The editors would like to thank cordially all the authors who accepted our invitation to present their very recent results. A number of authors of the papers in this issue are active in the 6th European Framework Research Program CARE—Coordinated Accelerators Research in Europe and ELAN—the European Linear Accelerator Network. Some authors are active in research programs of a global extent such as the LHC, ILC and GDE—the Global Design Effort for the International Linear Collider. We also would like to thank personally, as well as on behalf of all the authors, the Editorial Board of Measurement Science and Technology for accepting this very exciting field of contemporary metrology. This field seems to be really a birthplace of a host of new metrological technologies, where the driving force is the incredibly high technical requirements that must soon be fulfilled if we dream of building new accelerators for elementary particles, new biological materials and medicine alike. Special thanks are due to Professor R S Jachowicz of Warsaw University of Technology for initiating this issue and for continuous support and advice during our work.

Laser metrology and optic active control system for GAIA

NASA Astrophysics Data System (ADS)

D'Angelo, F.; Bonino, L.; Cesare, S.; Castorina, G.; Mottini, S.; Bertinetto, F.; Bisi, M.; Canuto, E.; Musso, F.

2017-11-01

The Laser Metrology and Optic Active Control (LM&OAC) program has been carried out under ESA contract with the purpose to design and validate a laser metrology system and an actuation mechanism to monitor and control at microarcsec level the stability of the Basic Angle (angle between the lines of sight of the two telescopes) of GAIA satellite. As part of the program, a breadboard (including some EQM elements) of the laser metrology and control system has been built and submitted to functional, performance and environmental tests. In the followings we describe the mission requirements, the system architecture, the breadboard design, and finally the performed validation tests. Conclusion and appraisals from this experience are also reported.

Non-null full field X-ray mirror metrology using SCOTS: a reflection deflectometry approach

DOE Office of Scientific and Technical Information (OSTI.GOV)

Su P.; Kaznatcheev K.; Wang, Y.

In a previous paper, the University of Arizona (UA) has developed a measurement technique called: Software Configurable Optical Test System (SCOTS) based on the principle of reflection deflectometry. In this paper, we present results of this very efficient optical metrology method applied to the metrology of X-ray mirrors. We used this technique to measure surface slope errors with precision and accuracy better than 100 nrad (rms) and {approx}200 nrad (rms), respectively, with a lateral resolution of few mm or less. We present results of the calibration of the metrology systems, discuss their accuracy and address the precision in measuring amore » spherical mirror.« less

International documentary standards and comparison of national physical measurement standards for the calibration of accelerometers

NASA Astrophysics Data System (ADS)

Evans, David J.

2002-11-01

The documentary standards defining internationally adopted methodologies and protocols for calibrating transducers used to measure vibration are currently developed under the International Organization for Standardization (ISO) Technical Committee 108 Sub Committee 3 (Use and calibration of vibration and shock measuring instruments). Recent revisions of the documentary standards on primary methods for the calibration of accelerometers used to measure rectilinear motion have been completed. These standards can be, and have been, used as references in the technical protocols of key international and regional comparisons between National Measurement Institutes (NMIs) on the calibration of accelerometers. These key comparisons are occurring in part as a result of the creation of the Mutual Recognition Arrangement between NMIs which has appendices that document the uncertainties, and the comparisons completed in support of the uncertainties, claimed by the National Laboratories that are signatories of the MRA. The measurements for the first international and the first Interamerican System of Metrology (SIM) regional key comparisons in vibration have been completed. These intercomparisons were promulgated via the relatively new Consultative Committee for Acoustics, Ultrasound and Vibration (CCAUV) of the International Committee for Weights and Measures (CIPM) and SIM Metrology Working Group (MWG) 9, respectively.

SIM key comparison for luminous flux. SIM.PR-K4

NASA Astrophysics Data System (ADS)

Matamoros, Carlos H.; Ohno, Yoshi; Zwinkels, Joanne; Cogno, Jorge A.; Couceiro, Iakyra B.

2016-01-01

In compliance with the established BIPM and CCPR policies and guidelines on comparisons, the SIM Photometry and Radiometry Working Group decided to conduct a key comparison on total luminous flux in order to provide an opportunity for its member National Metrology Institutes (NMIs) that did not participate in the CCPR-K4 comparison, to get a link to the reference value obtained for this quantity (the lumen) and to derive the corresponding degrees of equivalence. This SIM.PR-K4 was piloted by Centro Nacional de Metrología (CENAM), the NMI of Mexico and included the participation of five laboratories: CENAM (Mexico), INTI (Argentina), INMETRO (Brazil), NIST (USA, linking lab), and NRC (Canada, linking lab). The comparison, conducted in star type scheme, was run using three to four lamps per participant, and results are given in this report, including the unilateral degrees of equivalence. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCPR, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Fundamental performance determining factors of the ultrahigh-precision space-borne optical metrology system for the LISA Pathfinder mission

NASA Astrophysics Data System (ADS)

Hechenblaikner, Gerald; Flatscher, Reinhold

2013-05-01

The LISA Pathfinder mission to space employs an optical metrology system (OMS) at its core to measure the distance and attitude between two freely floating test-masses to picometer and nanorad accuracy, respectively, within the measurement band of [1 mHz, 30 mHz]. The OMS is based upon an ultra-stable optical bench with 4 heterodyne interferometers from which interference signals are read-out and processed by a digital phase-meter. Laser frequency noise, power fluctuations and optical path-length variations are suppressed to uncritical levels by dedicated control loops so that the measurement performance approaches the sensor limit imposed by the phasemeter. The system design is such that low frequency common mode noise which affects the read-out phase of all four interferometers is generally well suppressed by subtraction of a reference phase from the other interferometer signals. However, high frequency noise directly affects measurement performance and its common mode rejection depends strongly on the relative signal phases. We discuss how the data from recent test campaigns point towards high frequency phase noise as a likely performance limiting factor which explains some important performance features.

Improving the surface metrology accuracy of optical profilers by using multiple measurements

NASA Astrophysics Data System (ADS)

Xu, Xudong; Huang, Qiushi; Shen, Zhengxiang; Wang, Zhanshan

2016-10-01

The performance of high-resolution optical systems is affected by small angle scattering at the mid-spatial-frequency irregularities of the optical surface. Characterizing these irregularities is, therefore, important. However, surface measurements obtained with optical profilers are influenced by additive white noise, as indicated by the heavy-tail effect observable on their power spectral density (PSD). A multiple-measurement method is used to reduce the effects of white noise by averaging individual measurements. The intensity of white noise is determined using a model based on the theoretical PSD of fractal surface measurements with additive white noise. The intensity of white noise decreases as the number of times of multiple measurements increases. Using multiple measurements also increases the highest observed spatial frequency; this increase is derived and calculated. Additionally, the accuracy obtained using multiple measurements is carefully studied, with the analysis of both the residual reference error after calibration, and the random errors appearing in the range of measured spatial frequencies. The resulting insights on the effects of white noise in optical profiler measurements and the methods to mitigate them may prove invaluable to improve the quality of surface metrology with optical profilers.

Infrared spectroscopic ellipsometry in semiconductor manufacturing

NASA Astrophysics Data System (ADS)

Guittet, Pierre-Yves; Mantz, Ulrich; Weidner, Peter; Stehle, Jean-Louis; Bucchia, Marc; Bourtault, Sophie; Zahorski, Dorian

2004-05-01

Infrared spectroscopic ellipsometry (IRSE) metrology is an emerging technology in semiconductor production environment. Infineon Technologies SC300 implemented the first worldwide automated IRSE in a class 1 clean room in 2002. Combining properties of IR light -- large wavelength, low absorption in silicon -- with a short focus optics -- no backside reflection -- which allow model-based analysis, a large number of production applications were developed. Part of Infineon IRSE development roadmap is now focused on depth monitoring for arrays of 3D dry-etched structures. In trench DRAM manufacturing, the areal density is high, and critical dimensions are much lower than mid-IR wavelength. Therefore, extensive use of effective medium theory is made to model 3D structures. IR-SE metrology is not limited by shrinking critical dimensions, as long as the areal density is above a specific cut-off value determined by trenches dimensions, trench-filling and surrounding materials. Two applications for depth monitoring are presented. 1D models were developed and successfully applied to the DRAM trench capacitor structures. Modeling and correlation to reference methods are shown as well as dynamic repeatability and gauge capability results. Limitations of the current tool configuration are reviewed for shallow structures.

Ray-tracing of shape metrology data of grazing incidence x-ray astronomy mirrors

NASA Astrophysics Data System (ADS)

Zocchi, Fabio E.; Vernani, Dervis

2008-07-01

A number of future X-ray astronomy missions (e.g. Simbol-X, eROSITA) plan to utilize high throughput grazing incidence optics with very lightweight mirrors. The severe mass specifications require a further optimization of the existing technology with the consequent need of proper optical numerical modeling capabilities for both the masters and the mirrors. A ray tracing code has been developed for the simulation of the optical performance of type I Wolter masters and mirrors starting from 2D and 3D metrology data. In particular, in the case of 2D measurements, a 3D data set is reconstructed on the basis of dimensional references and used for the optical analysis by ray tracing. In this approach, the actual 3D shape is used for the optical analysis, thus avoiding the need of combining the separate contributions of different 2D measurements that require the knowledge of their interactions which is not normally available. The paper describes the proposed approach and presents examples of application on a prototype engineering master in the frame of ongoing activities carried out for present and future X-ray missions.

Absorption line metrology by optical feedback frequency-stabilized cavity ring-down spectroscopy

NASA Astrophysics Data System (ADS)

Burkart, Johannes; Kassi, Samir

2015-04-01

Optical feedback frequency-stabilized cavity ring-down spectroscopy (OFFS-CRDS) is a near-shot-noise-limited technique combining a sensitivity of with a highly linear frequency axis and sub-kHz resolution. Here, we give an in-depth review of the key elements of the experimental setup encompassing a highly stable V-shaped reference cavity, an integrated Mach-Zehnder modulator and a tightly locked ring-down cavity with a finesse of 450,000. Carrying out a detailed analysis of the spectrometer performance and its limitations, we revisit the photo-electron shot-noise limit in CRDS and discuss the impact of optical fringes. We demonstrate different active schemes for fringe cancelation by varying the phase of parasitic reflections. The proof-of-principle experiments reported here include a broadband high-resolution spectrum of carbon dioxide at 1.6 µm and an isolated line-shape measurement with a signal-to-noise ratio of 80,000. Beyond laboratory-based absorption line metrology for fundamental research, OFFS-CRDS holds a considerable potential for field laser measurements of trace gas concentrations and isotopic ratios by virtue of its small sample volume and footprint, the robust cavity-locking scheme and supreme precision.

Digital terrain modeling and industrial surface metrology: Converging realms

USGS Publications Warehouse

Pike, R.J.

2001-01-01

Digital terrain modeling has a micro-and nanoscale counterpart in surface metrology, the numerical characterization of industrial surfaces. Instrumentation in semiconductor manufacturing and other high-technology fields can now contour surface irregularities down to the atomic scale. Surface metrology has been revolutionized by its ability to manipulate square-grid height matrices that are analogous to the digital elevation models (DEMs) used in physical geography. Because the shaping of industrial surfaces is a spatial process, the same concepts of analytical cartography that represent ground-surface form in geography evolved independently in metrology: The surface topography of manufactured components, exemplified here by automobile-engine cylinders, is routinely modeled by variogram analysis, relief shading, and most other techniques of parameterization and visualization familiar to geography. This article introduces industrial surface-metrology, examines the field in the context of terrain modeling and geomorphology and notes their similarities and differences, and raises theoretical issues to be addressed in progressing toward a unified practice of surface morphometry.

Speckle-based portable device for in-situ metrology of x-ray mirrors at Diamond Light Source

NASA Astrophysics Data System (ADS)

Wang, Hongchang; Kashyap, Yogesh; Zhou, Tunhe; Sawhney, Kawal

2017-09-01

For modern synchrotron light sources, the push toward diffraction-limited and coherence-preserved beams demands accurate metrology on X-ray optics. Moreover, it is important to perform in-situ characterization and optimization of X-ray mirrors since their ultimate performance is critically dependent on the working conditions. Therefore, it is highly desirable to develop a portable metrology device, which can be easily implemented on a range of beamlines for in-situ metrology. An X-ray speckle-based portable device for in-situ metrology of synchrotron X-ray mirrors has been developed at Diamond Light Source. Ultra-high angular sensitivity is achieved by scanning the speckle generator in the X-ray beam. In addition to the compact setup and ease of implementation, a user-friendly graphical user interface has been developed to ensure that characterization and alignment of X-ray mirrors is simple and fast. The functionality and feasibility of this device is presented with representative examples.

EQ-10 electrodeless Z-pinch EUV source for metrology applications

NASA Astrophysics Data System (ADS)

Gustafson, Deborah; Horne, Stephen F.; Partlow, Matthew J.; Besen, Matthew M.; Smith, Donald K.; Blackborow, Paul A.

2011-11-01

With EUV Lithography systems shipping, the requirements for highly reliable EUV sources for mask inspection and resist outgassing are becoming better defined, and more urgent. The sources needed for metrology applications are very different than that needed for lithography; brightness (not power) is the key requirement. Suppliers for HVM EUV sources have all resources working on high power and have not entered the smaller market for metrology. Energetiq Technology has been shipping the EQ-10 Electrodeless Z-pinchTM light source since 19951. The source is currently being used for metrology, mask inspection, and resist development2-4. These applications require especially stable performance in both output power and plasma size and position. Over the last 6 years Energetiq has made many source modifications which have included better thermal management to increase the brightness and power of the source. We now have introduced a new source that will meet requirements of some of the mask metrology first generation tools; this source will be reviewed.

Metrological analysis of a virtual flowmeter-based transducer for cryogenic helium

DOE Office of Scientific and Technical Information (OSTI.GOV)

Arpaia, P., E-mail: pasquale.arpaia@unina.it; Technology Department, European Organization for Nuclear Research; Girone, M., E-mail: mario.girone@cern.ch

2015-12-15

The metrological performance of a virtual flowmeter-based transducer for monitoring helium under cryogenic conditions is assessed. At this aim, an uncertainty model of the transducer, mainly based on a valve model, exploiting finite-element approach, and a virtual flowmeter model, based on the Sereg-Schlumberger method, are presented. The models are validated experimentally on a case study for helium monitoring in cryogenic systems at the European Organization for Nuclear Research (CERN). The impact of uncertainty sources on the transducer metrological performance is assessed by a sensitivity analysis, based on statistical experiment design and analysis of variance. In this way, the uncertainty sourcesmore » most influencing metrological performance of the transducer are singled out over the input range as a whole, at varying operating and setting conditions. This analysis turns out to be important for CERN cryogenics operation because the metrological design of the transducer is validated, and its components and working conditions with critical specifications for future improvements are identified.« less

Performance of ASML YieldStar μDBO overlay targets for advanced lithography nodes C028 and C014 overlay process control

NASA Astrophysics Data System (ADS)

Blancquaert, Yoann; Dezauzier, Christophe; Depre, Jerome; Miqyass, Mohamed; Beltman, Jan

2013-04-01

Continued tightening of overlay control budget in semiconductor lithography drives the need for improved metrology capabilities. Aggressive improvements are needed for overlay metrology speed, accuracy and precision. This paper is dealing with the on product metrology results of a scatterometry based platform showing excellent production results on resolution, precision, and tool matching for overlay. We will demonstrate point to point matching between tool generations as well as between target sizes and types. Nowadays, for the advanced process nodes a lot of information is needed (Higher order process correction, Reticle fingerprint, wafer edge effects) to quantify process overlay. For that purpose various overlay sampling schemes are evaluated: ultra- dense, dense and production type. We will show DBO results from multiple target type and shape for on product overlay control for current and future node down to at least 14 nm node. As overlay requirements drive metrology needs, we will evaluate if the new metrology platform meets the overlay requirements.

Metrology - Beyond the Calibration Lab

NASA Technical Reports Server (NTRS)

Mimbs, Scott M.

2008-01-01

We rely on data from measurements every day; a gas-pump, a speedometer, and a supermarket weight scale are just three examples of measurements we use to make decisions. We generally accept the data from these measurements as "valid." One reason we can accept the data is the "legal metrology" requirements established and regulated by the government in matters of commerce. The measurement data used by NASA, other government agencies, and industry can be critical to decisions which affect everything from economic viability, to mission success, to the security of the nation. Measurement data can even affect life and death decisions. Metrology requirements must adequately provide for risks associated with these decisions. To do this, metrology must be integrated into all aspects of an industry including research, design, testing, and product acceptance. Metrology, the science of measurement, has traditionally focused on the calibration of instruments, and although instrument calibration is vital, it is only a part of the process that assures quality in measurement data. For example, measurements made in research can influence the fundamental premises that establish the design parameters, which then flow down to the manufacturing processes, and eventually impact the final product. Because a breakdown can occur anywhere within this cycle, measurement quality assurance has to be integrated into every part of the life-cycle process starting with the basic research and ending with the final product inspection process. The purpose of this paper is to discuss the role of metrology in the various phases of a product's life-cycle. For simplicity, the cycle will be divided in four broad phases, with discussions centering on metrology within NASA. .

An Assessment of Critical Dimension Small Angle X-ray Scattering Metrology for Advanced Semiconductor Manufacturing

DOE Office of Scientific and Technical Information (OSTI.GOV)

Settens, Charles M.

2015-01-01

Simultaneous migration of planar transistors to FinFET architectures, the introduction of a plurality of materials to ensure suitable electrical characteristics, and the establishment of reliable multiple patterning lithography schemes to pattern sub-10 nm feature sizes imposes formidable challenges to current in-line dimensional metrologies. Because the shape of a FinFET channel cross-section immediately influences the electrical characteristics, the evaluation of 3D device structures requires measurement of parameters beyond traditional critical dimension (CD), including their sidewall angles, top corner rounding and footing, roughness, recesses and undercuts at single nanometer dimensions; thus, metrologies require sub-nm and approaching atomic level measurement uncertainty. Synchrotron criticalmore » dimension small angle X-ray scattering (CD-SAXS) has unique capabilities to non-destructively monitor the cross-section shape of surface structures with single nanometer uncertainty and can perform overlay metrology to sub-nm uncertainty. In this dissertation, we perform a systematic experimental investigation using CD-SAXS metrology on a hierarchy of semiconductor 3D device architectures including, high-aspect-ratio contact holes, H2 annealed Si fins, and a series of grating type samples at multiple points along a FinFET fabrication process increasing in structural intricacy and ending with fully fabricated FinFET. Comparative studies between CD-SAXS metrology and other relevant semiconductor dimensional metrologies, particularly CDSEM, CD-AFM and TEM are used to determine physical limits of CD-SAXS approach for advanced semiconductor samples. CD-SAXS experimental tradeoffs, advice for model-dependent analysis and thoughts on the compatibility with a semiconductor manufacturing environment are discussed.« less

Hybrid Metrology and 3D-AFM Enhancement for CD Metrology Dedicated to 28 nm Node and Below Requirements

DOE Office of Scientific and Technical Information (OSTI.GOV)

Foucher, J.; Faurie, P.; Dourthe, L.

2011-11-10

The measurement accuracy is becoming one of the major components that have to be controlled in order to guarantee sufficient production yield. Already at the R and D level, we have to come up with the accurate measurements of sub-40 nm dense trenches and contact holes coming from 193 immersion lithography or E-Beam lithography. Current production CD (Critical Dimension) metrology techniques such as CD-SEM (CD-Scanning Electron Microscope) and OCD (Optical Critical Dimension) are limited in relative accuracy for various reasons (i.e electron proximity effect, outputs parameters correlation, stack influence, electron interaction with materials...). Therefore, time for R and D ismore » increasing, process windows degrade and finally production yield can decrease because you cannot manufactured correctly if you are unable to measure correctly. A new high volume manufacturing (HVM) CD metrology solution has to be found in order to improve the relative accuracy of production environment otherwise current CD Metrology solution will very soon get out of steam.In this paper, we will present a potential Hybrid CD metrology solution that smartly tuned 3D-AFM (3D-Atomic Force Microscope) and CD-SEM data in order to add accuracy both in R and D and production. The final goal for 'chip makers' is to improve yield and save R and D and production costs through real-time feedback loop implement on CD metrology routines. Such solution can be implemented and extended to any kind of CD metrology solution. In a 2{sup nd} part we will discuss and present results regarding a new AFM3D probes breakthrough with the introduction of full carbon tips made will E-Beam Deposition process. The goal is to overcome the current limitations of conventional flared silicon tips which are definitely not suitable for sub-32 nm nodes production.« less

First opportunity to synchronize the ILRS network thanks to T2L2 on Jason-2

NASA Astrophysics Data System (ADS)

Exertier, Pierre; Belli, Alexandre; Courde, Clément; Vernotte, François

2016-07-01

The Time Transfer by Laser Link (T2L2, on-board the oceanographic satellite Jason-2 at 1335 km) experiment allows us to synchronize remote clocks of Satellite Laser Ranging (SLR) stations throughout the whole ILRS (International Laser Ranging Service) network. We have developed a time transfer processing dedicated to non Common View (CV) cases, i.e. time transfer between stations from the Americas, Asia, Europe and Oceania. The main difficulty is to take into account the complex behaviour of the on-board Ultra Stable Oscillator (USO) over more than 1,500 s and up to a few thousands seconds. By integrating a recently published model describing the frequency responses of the USO to physical effects, as temperature and radiations, we show that it is possible to propagate the phase (time) of the on-board clock for an orbital revolution (1 rev = 6,700 s) or two with an error of a few nanoseconds (ns). Scheme of stages of this process is presented. The non CV time transfer process is applied in order to synchronize a plurality of remote stations involved in the T2L2/Jason-2 tracking by laser. The ground-to-space time transfers which we have processed over recent years (from 2013 to 2015) are all contributing to the development of a synthetic on-board time scale. The resulting ground-to-ground time transfers, computed between remote clocks of SLR stations, show differences of 250-300 ns up to a few microseconds ± 3-4 ns. The T2L2 space experiment is thus the first opportunity to estimate, quasi-instantaneously and to the ns level, time differences between clocks of the SLR stations which form one of the basis of the International Terrestrial Reference Frame (ITRF). This result would help the laser ranging community (time & frequency metrology of stations, analysis centres, and applications to the precise orbit and positioning) to achieve the GGOS (Global Geodetic Observing System) requirements in terms of accuracy and long-term stability of geodetic references.

Metrology Camera System Using Two-Color Interferometry

NASA Technical Reports Server (NTRS)

Dubovitsky, Serge; Liebe, Carl Christian; Peters, Robert; Lay, Oliver

2007-01-01

A metrology system that contains no moving parts simultaneously measures the bearings and ranges of multiple reflective targets in its vicinity, enabling determination of the three-dimensional (3D) positions of the targets with submillimeter accuracy. The system combines a direction-measuring metrology camera and an interferometric range-finding subsystem. Because the system is based partly on a prior instrument denoted the Modulation Sideband Technology for Absolute Ranging (MSTAR) sensor and because of its 3D capability, the system is denoted the MSTAR3D. Developed for use in measuring the shape (for the purpose of compensating for distortion) of large structures like radar antennas, it can also be used to measure positions of multiple targets in the course of conventional terrestrial surveying. A diagram of the system is shown in the figure. One of the targets is a reference target having a known, constant distance with respect to the system. The system comprises a laser for generating local and target beams at a carrier frequency; a frequency shifting unit to introduce a frequency shift offset between the target and local beams; a pair of high-speed modulators that apply modulation to the carrier frequency in the local and target beams to produce a series of modulation sidebands, the highspeed modulators having modulation frequencies of FL and FM; a target beam launcher that illuminates the targets with the target beam; optics and a multipixel photodetector; a local beam launcher that launches the local beam towards the multi-pixel photodetector; a mirror for projecting to the optics a portion of the target beam reflected from the targets, the optics being configured to focus the portion of the target beam at the multi-pixel photodetector; and a signal-processing unit connected to the photodetector. The portion of the target beam reflected from the targets produces spots on the multi-pixel photodetector corresponding to the targets, respectively, and the signal-processing unit centroids the spots to determine bearings of the targets, respectively. As the spots oscillate in intensity because they are mixed with the local laser beam that is flood illuminating the focal plane, the phase of oscillation of each spot is measured, the phase of sidebands in the oscillation of each spot being proportional to a distance to the corresponding target relative to the reference target A.

Field campaigns of the autonomous, closed-path, airborne TDLAS Hygrometer SEALDH-II and traceability to the German Primary Humidity Standards.

NASA Astrophysics Data System (ADS)

Buchholz, Bernhard; Ebert, Volker

2014-05-01

Airborne hygrometry is often demanded in scientific flight campaigns to provide datasets for environmental modeling or to correct for water vapor dilution or cross sensitivity effects in other gas analytical techniques. Water vapor measurements, however, are quite challenging due to the large dynamic range in the atmosphere (between 2 and 40000 ppmv) and the high spatio-temporal variability. Airborne hygrometers therefore need to combine a large measurement range with high temporal resolution to resolve - at typical airspeeds of 500 to 900 km/h - atmospheric gradients of several 1000 ppmv/s. Especially during the ascent into the upper troposphere, hygrometers need to work at high gas exchange rates to minimize water vapor adsorption effects. On the other hand, water vapor sensors are difficult to calibrate due to the strong water adsorption and the lack of bottled reference gas standards, which requires pre- or/and post-flight field calibrations. Recently in-flight calibration using an airborne H2O generator was demonstrated, which minimizes calibration drift but still imposes a lot of additional work and hardware to the experiments, since these kind of calibrations just transfer the accuracy level issues to the in-flight calibration-source. To make things worse, the low gas flow (1-5 std l/min, compared with up to 100 std l/min in flight for fast response instruments) adheres critical questions of wall absorption/desorption of the source and instrument even during the calibration process. The national metrological institutes (NMIs) maintain a global metrological water vapor scale which is defined via national primary humidity generators. These provide for calibration purposes well-defined, accurate water vapor samples of excellent comparability and stability traced back to the SI-units. The humidity calibration chain is maintained via high accuracy (but rather slow) Dew-Point-Mirror-Hygrometers as transfer standards. These provide a traceable performance and calibration link to any industrial or research laboratory hygrometer. To establish metrological traceability in field and particular in airborne hygrometers is however challenging and requires fast, field-compatible, metrologically qualified transfer hygrometry standards to link the metrological and the environmental sciences water scales. The SEALDH (Selective Extractive Airborne Laser Diode Hygrometer) development started 3 years ago and aims at filling this gap by using Tunable Diode Laser Absorption Spectroscopy (TDLAS) with a special, calibration-free data evaluation [1]. Previously developed, laboratory-based TDLAS instruments, such as [2] [3], were starting points to develop an autonomously operating, extractive water vapor sensor in a compact 19' 4 HU form factor. This new airborne package and far-reaching developments [4] in hard- and software allow an autonomous, low maintenance, airborne operation. SEALDH-II can be used in a calibration-free field sensor mode (with an absolute, metrologically defined uncertainty of 4.3% +- 3ppmv). The response time is mainly limited by the gas flow and significantly below 1 sec with a precision down to 0.08 ppmv (1σ, 1sec) measured at 600 ppmv and 1000 hPa. The excellent long-term stability of SEALDH-II (

Two Approaches to Calibration in Metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Campanelli, Mark

2014-04-01

Inferring mathematical relationships with quantified uncertainty from measurement data is common to computational science and metrology. Sufficient knowledge of measurement process noise enables Bayesian inference. Otherwise, an alternative approach is required, here termed compartmentalized inference, because collection of uncertain data and model inference occur independently. Bayesian parameterized model inference is compared to a Bayesian-compatible compartmentalized approach for ISO-GUM compliant calibration problems in renewable energy metrology. In either approach, model evidence can help reduce model discrepancy.

Dynamic metrology and data processing for precision freeform optics fabrication and testing

NASA Astrophysics Data System (ADS)

Aftab, Maham; Trumper, Isaac; Huang, Lei; Choi, Heejoo; Zhao, Wenchuan; Graves, Logan; Oh, Chang Jin; Kim, Dae Wook

2017-06-01

Dynamic metrology holds the key to overcoming several challenging limitations of conventional optical metrology, especially with regards to precision freeform optical elements. We present two dynamic metrology systems: 1) adaptive interferometric null testing; and 2) instantaneous phase shifting deflectometry, along with an overview of a gradient data processing and surface reconstruction technique. The adaptive null testing method, utilizing a deformable mirror, adopts a stochastic parallel gradient descent search algorithm in order to dynamically create a null testing condition for unknown freeform optics. The single-shot deflectometry system implemented on an iPhone uses a multiplexed display pattern to enable dynamic measurements of time-varying optical components or optics in vibration. Experimental data, measurement accuracy / precision, and data processing algorithms are discussed.

On Frequency Combs in Monolithic Resonators

NASA Astrophysics Data System (ADS)

Savchenkov, A. A.; Matsko, A. B.; Maleki, L.

2016-06-01

Optical frequency combs have become indispensable in astronomical measurements, biological fingerprinting, optical metrology, and radio frequency photonic signal generation. Recently demonstrated microring resonator-based Kerr frequency combs point the way towards chip scale optical frequency comb generator retaining major properties of the lab scale devices. This technique is promising for integrated miniature radiofrequency and microwave sources, atomic clocks, optical references and femtosecond pulse generators. Here we present Kerr frequency comb development in a historical perspective emphasizing its similarities and differences with other physical phenomena. We elucidate fundamental principles and describe practical implementations of Kerr comb oscillators, highlighting associated solved and unsolved problems.

A dynamic gravimetric standard for trace water.

PubMed

Brewer, P J; Goody, B A; Woods, P T; Milton, M J T

2011-10-01

A system for generating traceable reference standards of water vapor at trace levels between 5 and 2000 nmol/mol has been developed. It can provide different amount fractions of trace water vapor by using continuous accurate measurements of mass loss from a permeation device coupled with a dilution system based on an array of critical flow orifices. An estimated relative expanded uncertainty of ±2% has been achieved for most amount fractions generated. The system has been used in an international comparison and demonstrates excellent comparability with National Metrology Institutes maintaining standards of water vapor in this range using other methods.

65Zn and 133Ba standardizing by photon-photon coincidence counting

NASA Astrophysics Data System (ADS)

Loureiro, Jamir S.; da Cruz, Paulo A. L.; Iwahara, Akira; Delgado, José U.; Lopes, Ricardo T.

2018-03-01

The LNMRI/Brazil has deployed a system using X-gamma coincidence technique for the standardizing radionuclide, which present simple and complex decay scheme with X-rays of energy below 100 keV. The work was carried on radionuclide metrology laboratory using a sodium iodide detector, for gamma photons, in combination with a high purity germanium detector for X-rays. Samples of 65Zn and 133Ba were standardized and the results for both radionuclides showed good precision and accuracy when compared with reference values. The standardization differences were 0.72 % for 65Zn and 0.48 % for 133Ba samples.

How to measure a-few-nanometer-small LER occurring in EUV lithography processed feature

NASA Astrophysics Data System (ADS)

Kawada, Hiroki; Kawasaki, Takahiro; Kakuta, Junichi; Ikota, Masami; Kondo, Tsuyoshi

2018-03-01

For EUV lithography features we want to decrease the dose and/or energy of CD-SEM's probe beam because LER decreases with severe resist-material's shrink. Under such conditions, however, measured LER increases from true LER, due to LER bias that is fake LER caused by random noise in SEM image. A gap error occurs between the right and the left LERs. In this work we propose new procedures to obtain true LER by excluding the LER bias from the measured LER. To verify it we propose a LER's reference-metrology using TEM.

Certification and uncertainty evaluation of the certified reference materials of poly(ethylene glycol) for molecular mass fractions by using supercritical fluid chromatography.

PubMed

Takahashi, Kayori; Kishine, Kana; Matsuyama, Shigetomo; Saito, Takeshi; Kato, Haruhisa; Kinugasa, Shinichi

2008-07-01

Poly(ethylene glycol) (PEG) is a useful water-soluble polymer that has attracted considerable interest in medical and biological science applications as well as in polymer physics. Through the use of a well-calibrated evaporative light-scattering detector coupled with high performance supercritical fluid chromatography, we are able to determine exactly not only the average mass but also all of the molecular mass fractions of PEG samples needed for certified reference materials issued by the National Metrology Institute of Japan. In addition, experimental uncertainty was determined in accordance with the Guide to the expression of uncertainty in measurement (GUM). This reference material can be used to calibrate measuring instruments, to control measurement precision, and to confirm the validity of measurement methods when determining molecular mass distributions and average molecular masses. Especially, it is suitable for calibration against both masses and intensities for matrix-assisted laser desorption/ionization time-of-flight mass spectrometry.

Final report on COOMET Vickers PTB/VNIIFTRI key comparison (COOMET.M.H-K1.b and COOMET.M.H-K1.c)

NASA Astrophysics Data System (ADS)

Aslanyan, E.; Herrmann, K.

2013-01-01

This report describes a COOMET key comparison on Vickers hardness scales of two National Metrology Institutes—PTB and VNIIFTRI. The pilot laboratory was PTB, which was the linking institute with the key comparison reference values of CCM.H-K1. In the key comparison two sets of hardness reference blocks for the Vickers hardness scales HV1 and HV30, each consisting of three hardness reference blocks with the hardness levels 240 HV, 540 HV and 840 HV, are used. The same hardness reference blocks were used previously in the key comparison CCM.H-K1. The measurement results and uncertainty assessments, announced by VNIIFTRI, are in good agreement with the key comparison reference values of CCM.H-K1. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Effect of metrology time delay on overlay APC

NASA Astrophysics Data System (ADS)

Carlson, Alan; DiBiase, Debra

2002-07-01

The run-to-run control strategy of lithography APC is primarily composed of a feedback loop as shown in the diagram below. It is known that the insertion of a time delay in a feedback loop can cause degradation in control performance and could even cause a stable system to become unstable, if the time delay becomes sufficiently large. Many proponents of integrated metrology methods have cited the damage caused by metrology time delays as the primary justification for moving from a stand-alone to integrated metrology. While there is little dispute over the qualitative form of this argument, there has been very light published about the quantitative effects under real fab conditions - precisely how much control is lost due to these time delays. Another issue regarding time delays is that the length of these delays is not typically fixed - they vary from lot to lot and in some cases this variance can be large - from one hour on the short side to over 32 hours on the long side. Concern has been expressed that the variability in metrology time delays can cause undesirable dynamics in feedback loops that make it difficult to optimize feedback filters and gains and at worst could drive a system unstable. By using data from numerous fabs, spanning many sizes and styles of operation, we have conducted a quantitative study of the time delay effect on overlay run- to-run control. Our analysis resulted in the following conclusions: (1) There is a significant and material relationship between metrology time delay and overlay control under a variety of real world production conditions. (2) The run-to-run controller can be configured to minimize sensitivity to time delay variations. (3) The value of moving to integrated metrology can be quantified.

Metrology Laboratory | Energy Systems Integration Facility | NREL

Science.gov Websites

and artificial) Spectral reflectance and transmission of materials (functional check only , pyrheliometers,* pyranometers,* and pyrgeometers. The Metrology Laboratory provides National Institute of

Coordinate metrology of a primary surface composite panel from the Large Millimeter Telescope

NASA Astrophysics Data System (ADS)

Gale, David M.; Lucero Álvarez, Maribel; Cabrera Cuevas, Lizeth; Leon-Huerta, Andrea; Arizmendi Reyes, Edgar; Icasio Hernández, Octavio; Castro Santos, David; Hernández Ríos, Emilio; Tecuapetla Sosa, Esteban; Tzile Torres, Carlos; Viliesid Alonso, Miguel

2016-07-01

The Large Millimeter Telescope (LMT) is a single-dish fully-steerable radio telescope presently operating with a 32.5 m parabolic primary reflector, in the process of extension to 50 m. The project is managed by the Instituto Nacional de Astrofísica, Óptica y Electrónica (INAOE) in México, and the University of Massachusetts Amherst, USA. A laminated surface panel from the LMT primary reflector has been subjected to a surface measurement assay at Mexico's National Metrology Center (CENAM). Data obtained using a coordinate measuring machine and laser tracker owned by CENAM is compared with measurements using an identical model laser tracker and the photogrammetry technique, the latter systems owned and operated by the LMT. All measurements were performed within the controlled metrology environment at CENAM. The measurement exercise is intended to prepare the groundwork for converting this spare surface panel into a calibrated work-piece. The establishment of a calibrated work-piece provides quality assurance for metrology through measurement traceability. It also simplifies the evaluation of measurement uncertainty for coordinate metrology procedures used by the LMT project during reflector surface qualification.

Speckle-based at-wavelength metrology of X-ray mirrors with super accuracy

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kashyap, Yogesh; Wang, Hongchang; Sawhney, Kawal, E-mail: kawal.sawhney@diamond.ac.uk

2016-05-15

X-ray active mirrors, such as bimorph and mechanically bendable mirrors, are increasingly being used on beamlines at modern synchrotron source facilities to generate either focused or “tophat” beams. As well as optical tests in the metrology lab, it is becoming increasingly important to optimise and characterise active optics under actual beamline operating conditions. Recently developed X-ray speckle-based at-wavelength metrology technique has shown great potential. The technique has been established and further developed at the Diamond Light Source and is increasingly being used to optimise active mirrors. Details of the X-ray speckle-based at-wavelength metrology technique and an example of its applicabilitymore » in characterising and optimising a micro-focusing bimorph X-ray mirror are presented. Importantly, an unprecedented angular sensitivity in the range of two nanoradians for measuring the slope error of an optical surface has been demonstrated. Such a super precision metrology technique will be beneficial to the manufacturers of polished mirrors and also in optimization of beam shaping during experiments.« less

Progress of Multi-Beam Long Trace-Profiler Development

NASA Technical Reports Server (NTRS)

Gubarev, Mikhail; Kilaru, Kiranmayee; Merthe, Daniel J.; Kester, Thomas; McKinney, Wayne R.; Takacs, Peter Z.; Yashchuk, Valeriy V.

2012-01-01

The multi-beam long trace profiler (LTP) under development at NASA s Marshall Space Flight Center[1] is designed to increase the efficiency of metrology of replicated X-ray optics. The traditional LTP operates on a single laser beam that scans along the test surface to detect the slope errors. While capable of exceptional surface slope accuracy, the LTP single beam scanning has slow measuring speed. As metrology constitutes a significant fraction of the time spent in optics production, an increase in the efficiency of metrology helps in decreasing the cost of fabrication of the x-ray optics and in improving their quality. Metrology efficiency can be increased by replacing the single laser beam with multiple beams that can scan a section of the test surface at a single instance. The increase in speed with such a system would be almost proportional to the number of laser beams. A collaborative feasibility study has been made and specifications were fixed for a multi-beam long trace profiler. The progress made in the development of this metrology system is presented.

Geometric errors in 3D optical metrology systems

NASA Astrophysics Data System (ADS)

Harding, Kevin; Nafis, Chris

2008-08-01

The field of 3D optical metrology has seen significant growth in the commercial market in recent years. The methods of using structured light to obtain 3D range data is well documented in the literature, and continues to be an area of development in universities. However, the step between getting 3D data, and getting geometrically correct 3D data that can be used for metrology is not nearly as well developed. Mechanical metrology systems such as CMMs have long established standard means of verifying the geometric accuracies of their systems. Both local and volumentric measurments are characterized on such system using tooling balls, grid plates, and ball bars. This paper will explore the tools needed to characterize and calibrate an optical metrology system, and discuss the nature of the geometric errors often found in such systems, and suggest what may be a viable standard method of doing characterization of 3D optical systems. Finally, we will present a tradeoff analysis of ways to correct geometric errors in an optical systems considering what can be gained by hardware methods versus software corrections.

Optical Metrology for the Segmented Optics on the Constellation-X Spectroscopy X-Ray Telescope

NASA Technical Reports Server (NTRS)

Content, David; Colella, David; Fleetwood, Charles; Hadjimichael, Theo; Lehan, John; McMann, Joseph; Reid, Paul; Saha, Timo; Wright, Geraldine; Zhang, William

2004-01-01

We present the metrology requirements and metrology implementation necessary to prove out the reflector technology for the Constellation X(C-X) spectroscopy X-ray telescope (SXT). This segmented, 1.6m diameter highly nested Wolter-1 telescope presents many metrology and alignment challenges. In particular, these mirrors have a stringent imaging error budget as compared to their intrinsic stiffness; This is required for Constellation-X to have sufficient effective area with the weight requirement. This has implications for the metrology that can be used. A variety of contract and noncontact optical profiling and interferometric methods are combined to test the formed glass substrates before replication and the replicated reflector segments.The reflectors are tested both stand-alone and in-situ in an alignment tower.Some of these methods have not been used on prior X-ray telescopes and some are feasible only because of the segmented approach used on the SXT. Methods discussed include high precision coordinate measurement machines using very low force or optical probe axial interferometric profiling azimuthal circularity profiling and use of advanced null optics such as conical computer generated hologram (CGHs).

Theoferometer for the Construction of Precision Optomechanical Assemblies

NASA Technical Reports Server (NTRS)

Korzun, Ashley M.

2006-01-01

The increasing difficulty of metrology requirements on projects involving optics and the alignment of instrumentation on spacecraft has reached a turning point. Requirements as low as 0.1 arcseconds for the static, rotational alignment of components within a coordinate system cannot be met with a theodolite, the alignment tool currently in use. A "theoferometer" is an interferometer mounted on a rotation stage with degrees of freedom in azimuth and elevation for metrology and alignment applications. The success of a prototype theoferometer in approaching these metrology requirements led to a redesign stressing mechanical, optical, and software changes to increase the sensitivity and portability of the unit. This paper covers the improvements made to the first prototype theoferometer, characteristic testing, and demonstration of the redesigned theoferometer s capabilities as a "theodolite replacement" and low-uncertainty metrology tool.

Recent progress in understanding the imaging and metrology using the helium ion microscope

NASA Astrophysics Data System (ADS)

Postek, Michael T.; Vladar, Andras E.; Ming, Bin

2009-05-01

Nanotechnology is pushing imaging and measurement instrument technology to high levels of required performance. As this continues, new barriers confronting innovation in this field are encountered. Particle beam instrument resolution remains one of these barriers. A new tool for imaging and metrology for nanotechnology is the scanning Helium Ion Microscope (HIM). The HIM is a new approach to imaging and metrology for nanotechnology which may be able to push this barrier lower. As a new methodology, it is just beginning to show promise and the number of potentially advantageous applications for nanotechnology and nanometrology has yet to be fully exploited. This presentation will discuss some of the progress made at NIST in collaboration with the manufacturing community in understanding the imaging and metrology for this new technology.

Earthquakes and sea level - Space and terrestrial metrology on a changing planet

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bilham, R.

1991-02-01

A review is presented of the stability and scale of crustal deformation metrology which has particular relevance to monitoring deformation associated with sea level and earthquakes. Developments in space geodesy and crustal deformation metrology in the last two decades have the potential to acquire a homogeneous global data set for monitoring relative horizontal and vertical motions of the earth's surface to within several millimeters. New tools discussed for forecasting sea level rise and damaging earthquakes include: very long baseline interferometry, satellite laser ranging, the principles of GPS geodesy, and new sea level sensors. Space geodesy permits a unified global basismore » for future metrology of the earth, and the continued availability of the GPS is currently fundamental to this unification.« less

The role of LATU as national metrology institute of Uruguay and its responsibilities

NASA Astrophysics Data System (ADS)

Robatto, O.; Quagliata, E.; Santo, C.; Sica, A.; Sponton, M.

2013-09-01

Laboratorio Tecnológico del Uruguay (LATU) is the National Metrology Institute of Uruguay and has the obligation to maintain the national standards stated by National Law 15298. At present LATU is acting as a secondary laboratory as well as a primary laboratory. LATU was ISO 17025:2005 DKD (Deutscher Kalibrierdienst) accredited from 2001 up to 2007. By that time LATU decided to support its Capabilities of Measurement and Calibration (CMCs) at CIPM-MRA (Mutual Recognition Arrangement between national metrology institutes (NMIs)) by peer assessment. A Peer Review has been done in 2008 in order to get the QSTF (Sistema Interamericano de Metrología, Quality System Task Force) approval. "New "CMCs for Industrial Thermometers have been approved by the JCRB on September 2010. CMCs claimed for Standard Resistance Platinum Thermometers (SPRTs) calibration at fixed points have not been approved yet because there were some requirements of traceability of employed cells that were not fulfilled but will be solved properly. The declared CMCs have been chosen by LATU in order to cover the increasing calibration services required by the industry and the secondary calibration laboratories. To demonstrate its technical competence an support its declared "CMCs" LATU has also participated at bilateral and regional comparisons. In recent years LATU, the National Accreditation Body (OUA), the Standards Institute, the National Institute of Quality and Compliance Bodies have become Members of a new Institution to strengthen the Quality Infrastructure of the country (SUNAMEC). As part of this new activities, LATU is giving training courses to the secondary laboratories performing calibrations in temperature that want to get accredited by the National Accreditation Body and to act as Technical Evaluators or Auditors when required by OUA. It is expected, that in the future and in the frame of new accredited and recognized temperature calibration laboratories, LATU could strengthen its activities in maintaining its own national standards, developing new calibration services and performing comparisons as pilot laboratory for Uruguay and also regionally. The role of secondary laboratory could be diminished and therefore the activities as a reference laboratory in investigation would be benefited. This paper describes all the activities carried out at LATU in Temperature in the last years to reach the goals stated and the coming ones that have to be done to help developing main objectives as a country in this field.

Advances in process overlay on 300-mm wafers

NASA Astrophysics Data System (ADS)

Staecker, Jens; Arendt, Stefanie; Schumacher, Karl; Mos, Evert C.; van Haren, Richard J. F.; van der Schaar, Maurits; Edart, Remi; Demmerle, Wolfgang; Tolsma, Hoite

2002-07-01

Overlay budgets are getting tighter within 300 mm volume production and as a consequence the process effects on alignment and off-line metrology becomes more important. In a short loop experiment, with cleared reference marks in each image field, the isolated effect of processing was measured with a sub-nanometer accuracy. The examined processes are Shallow Trench Isolation (STI), Tungsten-Chemical Mechanical Processing (W-CMP) and resist spinning. The alignment measurements were done on an ASML TWINSCANT scanner and the off-line metrology measurements on a KLA Tencor. Mark type and mark position dependency of the process effects are analyzed. The mean plus 3 (sigma) of the maximum overlay after correcting batch average wafer parameters is used as an overlay performance indicator (OPI). 3 (sigma) residuals to the wafer-model are used as an indicator of the noise that is added by the process. The results are in agreement with existing knowledge of process effects on 200 mm wafers. The W-CMP process introduces an additional wafer rotation and scaling that is similar for alignment marks and metrology targets. The effects depend on the mark type; in general they get less severe for higher spatial frequencies. For a 7th order alignment mark, the OPI measured about 12 nm and the added noise about 12 nm. For the examined metrology targets the OPI is about 20 nm with an added noise of about 90 nm. Two different types of alignment marks were tested in the STI process, i.e., zero layer marks and marks that were exposed together with the STI product. The overlay contribution due to processing on both types of alignment marks is very low (smaller than 5 nm OPI) and independent on mark type. Some flyers are observed fot the zero layer marks. The flyers can be explained by the residues of oxide and nitride that is left behind in the spaces of the alignment marks. Resist spinning is examined on single layer resist and resist with an organic Bottom Anti-Reflective Coating (BARC) underneath. Single layer resist showed scaling on unsegmented marks that disappears using higher diffraction orders and/or mark segmentation. Resist with a planarizing BARC caused additional effects on the wafer edge for measurements with the red laser signal. The effects disappear using the green laser of ATHENAT.

Integration of mask and silicon metrology in DFM

NASA Astrophysics Data System (ADS)

Matsuoka, Ryoichi; Mito, Hiroaki; Sugiyama, Akiyuki; Toyoda, Yasutaka

2009-03-01

We have developed a highly integrated method of mask and silicon metrology. The method adopts a metrology management system based on DBM (Design Based Metrology). This is the high accurate contouring created by an edge detection algorithm used in mask CD-SEM and silicon CD-SEM. We have inspected the high accuracy, stability and reproducibility in the experiments of integration. The accuracy is comparable with that of the mask and silicon CD-SEM metrology. In this report, we introduce the experimental results and the application. As shrinkage of design rule for semiconductor device advances, OPC (Optical Proximity Correction) goes aggressively dense in RET (Resolution Enhancement Technology). However, from the view point of DFM (Design for Manufacturability), the cost of data process for advanced MDP (Mask Data Preparation) and mask producing is a problem. Such trade-off between RET and mask producing is a big issue in semiconductor market especially in mask business. Seeing silicon device production process, information sharing is not completely organized between design section and production section. Design data created with OPC and MDP should be linked to process control on production. But design data and process control data are optimized independently. Thus, we provided a solution of DFM: advanced integration of mask metrology and silicon metrology. The system we propose here is composed of followings. 1) Design based recipe creation: Specify patterns on the design data for metrology. This step is fully automated since they are interfaced with hot spot coordinate information detected by various verification methods. 2) Design based image acquisition: Acquire the images of mask and silicon automatically by a recipe based on the pattern design of CD-SEM.It is a robust automated step because a wide range of design data is used for the image acquisition. 3) Contour profiling and GDS data generation: An image profiling process is applied to the acquired image based on the profiling method of the field proven CD metrology algorithm. The detected edges are then converted to GDSII format, which is a standard format for a design data, and utilized for various DFM systems such as simulation. Namely, by integrating pattern shapes of mask and silicon formed during a manufacturing process into GDSII format, it makes it possible to bridge highly accurate pattern profile information over to the design field of various EDA systems. These are fully integrated into design data and automated. Bi-directional cross probing between mask data and process control data is allowed by linking them. This method is a solution for total optimization that covers Design, MDP, mask production and silicon device producing. This method therefore is regarded as a strategic DFM approach in the semiconductor metrology.

Enabling CD SEM metrology for 5nm technology node and beyond

NASA Astrophysics Data System (ADS)

Lorusso, Gian Francesco; Ohashi, Takeyoshi; Yamaguchi, Astuko; Inoue, Osamu; Sutani, Takumichi; Horiguchi, Naoto; Bömmels, Jürgen; Wilson, Christopher J.; Briggs, Basoene; Tan, Chi Lim; Raymaekers, Tom; Delhougne, Romain; Van den Bosch, Geert; Di Piazza, Luca; Kar, Gouri Sankar; Furnémont, Arnaud; Fantini, Andrea; Donadio, Gabriele Luca; Souriau, Laurent; Crotti, Davide; Yasin, Farrukh; Appeltans, Raf; Rao, Siddharth; De Simone, Danilo; Rincon Delgadillo, Paulina; Leray, Philippe; Charley, Anne-Laure; Zhou, Daisy; Veloso, Anabela; Collaert, Nadine; Hasumi, Kazuhisa; Koshihara, Shunsuke; Ikota, Masami; Okagawa, Yutaka; Ishimoto, Toru

2017-03-01

The CD SEM (Critical Dimension Scanning Electron Microscope) is one of the main tools used to estimate Critical Dimension (CD) in semiconductor manufacturing nowadays, but, as all metrology tools, it will face considerable challenges to keep up with the requirements of the future technology nodes. The root causes of these challenges are not uniquely related to the shrinking CD values, as one might expect, but to the increase in complexity of the devices in terms of morphology and chemical composition as well. In fact, complicated threedimensional device architectures, high aspect ratio features, and wide variety of materials are some of the unavoidable characteristics of the future metrology nodes. This means that, beside an improvement in resolution, it is critical to develop a CD SEM metrology capable of satisfying the specific needs of the devices of the nodes to come, needs that sometimes will have to be addressed through dramatic changes in approach with respect to traditional CD SEM metrology. In this paper, we report on the development of advanced CD SEM metrology at imec on a variety of device platform and processes, for both logic and memories. We discuss newly developed approaches for standard, IIIV, and germanium FinFETs (Fin Field Effect Transistors), for lateral and vertical nanowires (NW), 3D NAND (three-dimensional NAND), STT-MRAM (Spin Transfer Magnetic Torque Random-Access Memory), and ReRAM (Resistive Random Access Memory). Applications for both front-end of line (FEOL) and back-end of line (BEOL) are developed. In terms of process, S/D Epi (Source Drain Epitaxy), SAQP (Self-Aligned Quadruple Patterning), DSA (Dynamic Self-Assembly), and EUVL (Extreme Ultraviolet Lithography) have been used. The work reported here has been performed on Hitachi CG5000, CG6300, and CV5000. In terms of logic, we discuss here the S/D epi defect classification, the metrology optimization for STI (Shallow Trench Isolation) Ge FinFETs, the defectivity of III-V STI FinFETs,, metrology for vertical and horizontal NWs. With respect to memory, we discuss a STT-RAM statistical CD analysis and its comparison to electrical performance, ReRAM metrology for VMCO (Vacancy-modulated conductive oxide) with comparison with electrical performance, 3D NAND ONO (Oxide Nitride Oxide) thickness measurements. In addition, we report on 3D morphological reconstruction using CD SEM in conjunction with FIB (Focused Ion Beam), on optimized BKM (Best Known Methods) development methodologies, and on CD SEM overlay. The large variety of results reported here gives a clear overview of the creative effort put in place to ensure that the critical potential of CD SEM metrology tools is fully enabled for the 5nm node and beyond.

Solar Radiation Research Laboratory | Energy Systems Integration Facility |

Science.gov Websites

radiation components, and has expanded its expertise to include integrated metrology, optics, electronics Acquisition Laboratory, Metrology Laboratory, Optics Laboratory, and Electronics Laboratory. Photo of a

Consultative Committee on Ionizing Radiation: Impact on Radionuclide Metrology

PubMed Central

Karam, L.R.; Ratel, G.

2016-01-01

In response to the CIPM MRA, and to improve radioactivity measurements in the face of advancing technologies, the CIPM’s consultative committee on ionizing radiation developed a strategic approach to the realization and validation of measurement traceability for radionuclide metrology. As a consequence, measurement institutions throughout the world have devoted no small effort to establish radionuclide metrology capabilities, supported by active quality management systems and validated through prioritized participation in international comparisons, providing a varied stakeholder community with measurement confidence. PMID:26688351

Vacuum Technology Considerations For Mass Metrology

PubMed Central

Abbott, Patrick J.; Jabour, Zeina J.

2011-01-01

Vacuum weighing of mass artifacts eliminates the necessity of air buoyancy correction and its contribution to the measurement uncertainty. Vacuum weighing is also an important process in the experiments currently underway for the redefinition of the SI mass unit, the kilogram. Creating the optimum vacuum environment for mass metrology requires careful design and selection of construction materials, plumbing components, pumping, and pressure gauging technologies. We review the vacuum technology1 required for mass metrology and suggest procedures and hardware for successful and reproducible operation. PMID:26989593

Application of Ionic Liquids in Amperometric Gas Sensors.

PubMed

Gębicki, Jacek; Kloskowski, Adam; Chrzanowski, Wojciech; Stepnowski, Piotr; Namiesnik, Jacek

2016-01-01

This article presents an analysis of available literature data on metrological parameters of the amperometric gas sensors containing ionic liquids as an electrolyte. Four mechanism types of signal generation in amperometric sensors with ionic liquid are described. Moreover, this article describes the influence of selected physico-chemical properties of the ionic liquids on the metrological parameters of these sensors. Some metrological parameters are also compared for amperometric sensors with GDE and SPE electrodes and with ionic liquids for selected analytes.

The Opportunities and Challenges of Bringing New Metrology Equipment to Market

NASA Astrophysics Data System (ADS)

Perloff, David S.

2005-09-01

This paper provides an overview of the economic and technological factors which are driving the demand for new metrology and inspection equipment, the challenges and opportunities facing new companies in bringing such equipment to market, and the funding environment in which new companies must raise capital to finance their efforts. Seven metrology companies and one inspection equipment company that have received first-time venture backing since 2000 are used to illustrate how these specialized businesses are launched and funded.

Cryogenic flow rate measurement with a laser Doppler velocimetry standard

NASA Astrophysics Data System (ADS)

Maury, R.; Strzelecki, A.; Auclercq, C.; Lehot, Y.; Loubat, S.; Chevalier, J.; Ben Rayana, F.

2018-03-01

A very promising alternative to the state-of-the-art static volume measurements for liquefied natural gas (LNG) custody transfer processes is the dynamic principle of flow metering. As the Designated Institute (DI) of the LNE (‘Laboratoire National de métrologie et d’Essais’, being the French National Metrology Institute) for high-pressure gas flow metering, Cesame-Exadebit is involved in various research and development programs. Within the framework of the first (2010-2013) and second (2014-2017) EURAMET Joint Research Project (JRP), named ‘Metrological support for LNG custody transfer and transport fuel applications’, Cesame-Exadebit explored a novel cryogenic flow metering technology using laser Doppler velocimetry (LDV) as an alternative to ultrasonic and Coriolis flow metering. Cesame-Exadebit is trying to develop this technique as a primary standard for cryogenic flow meters. Currently, cryogenic flow meters are calibrated at ambient temperatures with water. Results are then extrapolated to be in the Reynolds number range of real applications. The LDV standard offers a unique capability to perform online calibration of cryogenic flow meters in real conditions (temperature, pressure, piping and real flow disturbances). The primary reference has been tested on an industrial process in a LNG terminal during truck refuelling. The reference can calibrate Coriolis flow meters being used daily with all the real environmental constraints, and its utilisation is transparent for LNG terminal operators. The standard is traceable to Standard International units and the combined extended uncertainties have been determined and estimated to be lower than 0.6% (an ongoing improvement to reducing the correlation function uncertainty, which has a major impact in the uncertainty estimation).

Multi-user quantum key distribution with entangled photons from an AlGaAs chip

NASA Astrophysics Data System (ADS)

Autebert, C.; Trapateau, J.; Orieux, A.; Lemaître, A.; Gomez-Carbonell, C.; Diamanti, E.; Zaquine, I.; Ducci, S.

2016-12-01

In view of real-world applications of quantum information technologies, the combination of miniature quantum resources with existing fibre networks is a crucial issue. Among such resources, on-chip entangled photon sources play a central role for applications spanning quantum communications, computing and metrology. Here, we use a semiconductor source of entangled photons operating at room temperature in conjunction with standard telecom components to demonstrate multi-user quantum key distribution, a core protocol for securing communications in quantum networks. The source consists of an AlGaAs chip-emitting polarisation entangled photon pairs over a large bandwidth in the main telecom band around 1550 nm without the use of any off-chip compensation or interferometric scheme; the photon pairs are directly launched into a dense wavelength division multiplexer (DWDM) and secret keys are distributed between several pairs of users communicating through different channels. We achieve a visibility measured after the DWDM of 87% and show long-distance key distribution using a 50-km standard telecom fibre link between two network users. These results illustrate a promising route to practical, resource-efficient implementations adapted to quantum network infrastructures.

A new approach to pattern metrology

NASA Astrophysics Data System (ADS)

Ausschnitt, Christopher P.

2004-05-01

We describe an approach to pattern metrology that enables the simultaneous determination of critical dimensions, overlay and film thickness. A single optical system captures nonzero- and zero-order diffracted signals from illuminated grating targets, as well as unpatterned regions of the surrounding substrate. Differential targets provide in situ dimensional calibration. CD target signals are analyzed to determine average dimension, profile attributes, and effective dose and defocus. In turn, effective dose and defocus determines all CDs pre-correlated to the dose and focus settings of the exposure tool. Overlay target signals are analyzed to determine the relative reflectivity of the layer pair and the overlay error between them. Compared to commercially available pattern metrology (SEM, optical microscopy, AFM, scatterometry and schnitzlometry), our approach promises improved signal-to-noise, higher throughput and smaller targets. We have dubbed this optical chimera MOXIE (Metrology Of eXtremely Irrational Exuberance).

1.5 nm fabrication of test patterns for characterization of metrological systems

DOE PAGES

Babin, Sergey; Calafiore, Giuseppe; Peroz, Christophe; ...

2015-11-06

Any metrology tool is only as good as it is calibrated. The characterization of metrology systems requires test patterns at a scale about ten times smaller than the measured features. The fabrication of patterns with linewidths down to 1.5 nm is described. The test sample was designed in such a way that the distribution of linewidths appears to be random at any location. This pseudorandom test pattern is used to characterize dimensional metrology equipment over its entire dynamic range by extracting the modulation transfer function of the system. The test pattern contains alternating lines of silicon and tungsten silicide, eachmore » according to its designed width. As a result, the fabricated test samples were imaged using a transmission electron microscope, a scanning electron microscope, and an atomic force microscope. (C) 2015 American Vacuum Society.« less

Influence of the air’s refractive index on precision angle metrology with autocollimators

NASA Astrophysics Data System (ADS)

Geckeler, Ralf D.; Křen, Petr; Just, Andreas; Schumann, Matthias; Krause, Michael

2018-07-01

In this paper, we discuss a substantial—though previously neglected—error source in precision metrology with autocollimators, specifically, changes in the air’s refractive index, with a focus on the dominant impact of pressure changes. Pressure decreases with increasing elevation above sea level and is subject to substantial variation due to weather changes. It causes changes in an autocollimator’s angle response which are proportional to the measured angle and which increase linearly with the beam length and air pressure. We characterise this important influence in detail by using extended theoretical and experimental investigations and derive strategies for correcting it. We discuss its implications for the comparison of autocollimator calibrations performed at different metrology institutes which is crucial for validating their calibration capabilities. This work aims at approaching fundamental limits in angle metrology with autocollimators.

Phase shifting white light interferometry using colour CCD for optical metrology and bio-imaging applications

NASA Astrophysics Data System (ADS)

Upputuri, Paul Kumar; Pramanik, Manojit

2018-02-01

Phase shifting white light interferometry (PSWLI) has been widely used for optical metrology applications because of their precision, reliability, and versatility. White light interferometry using monochrome CCD makes the measurement process slow for metrology applications. WLI integrated with Red-Green-Blue (RGB) CCD camera is finding imaging applications in the fields optical metrology and bio-imaging. Wavelength dependent refractive index profiles of biological samples were computed from colour white light interferograms. In recent years, whole-filed refractive index profiles of red blood cells (RBCs), onion skin, fish cornea, etc. were measured from RGB interferograms. In this paper, we discuss the bio-imaging applications of colour CCD based white light interferometry. The approach makes the measurement faster, easier, cost-effective, and even dynamic by using single fringe analysis methods, for industrial applications.

High-volume manufacturing device overlay process control

NASA Astrophysics Data System (ADS)

Lee, Honggoo; Han, Sangjun; Woo, Jaeson; Lee, DongYoung; Song, ChangRock; Heo, Hoyoung; Brinster, Irina; Choi, DongSub; Robinson, John C.

2017-03-01

Overlay control based on DI metrology of optical targets has been the primary basis for run-to-run process control for many years. In previous work we described a scenario where optical overlay metrology is performed on metrology targets on a high frequency basis including every lot (or most lots) at DI. SEM based FI metrology is performed ondevice in-die as-etched on an infrequent basis. Hybrid control schemes of this type have been in use for many process nodes. What is new is the relative size of the NZO as compared to the overlay spec, and the need to find more comprehensive solutions to characterize and control the size and variability of NZO at the 1x nm node: sampling, modeling, temporal frequency and control aspects, as well as trade-offs between SEM throughput and accuracy.

Confocal Microscopy

NASA Astrophysics Data System (ADS)

Liu, Jian; Tan, Jiubin

2016-12-01

The confocal microscope is appropriate for imaging cells or the measurement of industrial artefacts. However, junior researchers and instrument users sometimes misuse imaging concepts and metrological characteristics, such as position resolution in industrial metrology and scale resolution in bio-imaging. And, metrological characteristics or influence factors in 3D measurement such as height assessment error caused by 3D coupling effect are so far not yet identified. In this book, the authors outline their practices by the working experiences on standardization and system design. This book assumes little previous knowledge of optics, but rich experience in engineering of industrial measurements, in particular with profile metrology or areal surface topography will be very helpful to understand the theoretical concerns and value of the technological advances. It should be useful for graduate students or researchers as extended reading material, as well as microscope users alongside their handbook.

DLP-based 3D metrology by structured light or projected fringe technology for life sciences and industrial metrology

NASA Astrophysics Data System (ADS)

Frankowski, G.; Hainich, R.

2009-02-01

Since the mid-eighties, a fundamental idea for achieving measuring accuracy in projected fringe technology was to consider the projected fringe pattern as an interferogram and evaluate it on the basis of advanced algorithms widely used for phase measuring in real-time interferometry. A fundamental requirement for obtaining a sufficiently high degree of measuring accuracy with this so-called "phase measuring projected fringe technology" is that the projected fringes, analogous to interference fringes, must have a cos2-shaped intensity distribution. Until the mid-nineties, this requirement for the projected fringe pattern measurement technology presented a basic handicap for its wide application in 3D metrology. This situation changed abruptly, when in the nineties Texas Instruments introduced to the market advanced digital light projection on the basis of micro mirror based projection systems, socalled DLP technology, which also facilitated the generation and projection of cos2-shaped intensity and/or fringe patterns. With this DLP technology, which from its original approach was actually oriented towards completely different applications such as multimedia projection, Texas Instruments boosted phase-measuring fringe projection in optical 3D metrology to a worldwide breakthrough both for medical as well as industrial applications. A subject matter of the lecture will be to present the fundamental principles and the resulting advantages of optical 3D metrology based on phase-measuring fringe projection using DLP technology. Further will be presented and discussed applications of the measurement technology in medical engineering and industrial metrology.

[The EFS metrology: From the production to the reason].

PubMed

Reifenberg, J-M; Riout, E; Leroy, A; Begue, S

2014-06-01

In order to answer statutory requirements and to anticipate the future needs and standards, the EFS is committed, since a few years, in a process of harmonization of its metrology function. In particular, the institution has opted for the skills development by internalizing the metrological traceability of the main critical quantities (temperature, volumetric) measurements. The development of metrology so resulted in a significant increase in calibration and testing activities. Methods are homogenized and improved through accreditations. The investment strategies are based on more and more demanding specifications. The performance of the equipments is better known and mastered. Technical expertise and maturity of the national metrology function today are assets to review in more informed ways the appropriateness of the applied periodicities. Analysis of numerous information and data in the calibration and testing reports could be pooled and operated on behalf of the unique establishment. The objective of this article is to illustrate these reflections with a few examples from of a feedback of the EFS Pyrénées Méditerranée. The analysis of some methods of qualification, the exploitation of the historical metrology in order to quantify the risk of non-compliance, and to adapt the control strategy, analysis of the criticality of an instrument in a measurement process, risk analyses are tools that deserve to be more widely exploited for that discipline wins in efficiency at the national level. Copyright © 2014 Elsevier Masson SAS. All rights reserved.

Signal processing for order 10 PM accuracy displacement metrology in real-world scientific applications

NASA Astrophysics Data System (ADS)

Halverson, Peter G.; Loya, Frank M.

2017-11-01

Projects such as the Space Interferometry Mission (SIM) [1] and Terrestrial Planet Finder (TPF) [2] rely heavily on sub-nanometer accuracy metrology systems to define their optical paths and geometries. The James Web Space Telescope (JWST) is using this metrology in a cryogenic dilatometer for characterizing material properties (thermal expansion, creep) of optical materials. For all these projects, a key issue has been the reliability and stability of the electronics that convert displacement metrology signals into real-time distance determinations. A particular concern is the behavior of the electronics in situations where laser heterodyne signals are weak or noisy and subject to abrupt Doppler shifts due to vibrations or the slewing of motorized optics. A second concern is the long-term (hours to days) stability of the distance measurements under conditions of drifting laser power and ambient temperature. This paper describes heterodyne displacement metrology gauge signal processing methods that achieve satisfactory robustness against low signal strength and spurious signals, and good long-term stability. We have a proven displacement-measuring approach that is useful not only to space-optical projects at JPL, but also to the wider field of distance measurements.

On-orbit Metrology and Calibration Requirements for Space Station Activities Definition Study

NASA Technical Reports Server (NTRS)

Cotty, G. M.; Ranganathan, B. N.; Sorrell, A. L.

1989-01-01

The Space Station is the focal point for the commercial development of space. The long term routine operation of the Space Station and the conduct of future commercial activities suggests the need for in-space metrology capabilities analogous when possible to those on-Earth. The ability to perform periodic calibrations and measurements with proper traceability is imperative for the routine operation of the Space Station. An initial review, however, indicated a paucity of data related to metrology and calibration requirements for in-space operations. This condition probably exists because of the highly developmental aspect of space activities to date, their short duration, and nonroutine nature. The on-orbit metrology and calibration needs of the Space Station were examined and assessed. In order to achieve this goal, the following tasks were performed: an up-to-date literature review; identification of on-orbit calibration techniques; identification of sensor calibration requirements; identification of calibration equipment requirements; definition of traceability requirements; preparation of technology development plans; and preparation of the final report. Significant information and major highlights pertaining to each task is presented. In addition, some general (generic) conclusions/observations and recommendations that are pertinent to the overall in-space metrology and calibration activities are presented.

Developments in optical modeling methods for metrology

NASA Astrophysics Data System (ADS)

Davidson, Mark P.

1999-06-01

Despite the fact that in recent years the scanning electron microscope has come to dominate the linewidth measurement application for wafer manufacturing, there are still many applications for optical metrology and alignment. These include mask metrology, stepper alignment, and overlay metrology. Most advanced non-optical lithographic technologies are also considering using topics for alignment. In addition, there have been a number of in-situ technologies proposed which use optical measurements to control one aspect or another of the semiconductor process. So optics is definitely not dying out in the semiconductor industry. In this paper a description of recent advances in optical metrology and alignment modeling is presented. The theory of high numerical aperture image simulation for partially coherent illumination is discussed. The implications of telecentric optics on the image simulation is also presented. Reciprocity tests are proposed as an important measure of numerical accuracy. Diffraction efficiencies for chrome gratings on reticles are one good way to test Kirchoff's approximation as compared to rigorous calculations. We find significant differences between the predictions of Kirchoff's approximation and rigorous methods. The methods for simulating brightfield, confocal, and coherence probe microscope imags are outlined, as are methods for describing aberrations such as coma, spherical aberration, and illumination aperture decentering.

Comparison of density determination of liquid samples by density meters

NASA Astrophysics Data System (ADS)

Buchner, C.; Wolf, H.; Vámossy, C.; Lorefice, S.; Lenard, E.; Spohr, I.; Mares, G.; Perkin, M.; Parlic-Risovic, T.; Grue, L.-L.; Tammik, K.; van Andel, I.; Zelenka, Z.

2016-01-01

Hydrostatic density determinations of liquids as reference material are mainly performed by National Metrology Institutes to provide means for calibrating or checking liquid density measuring instruments such as oscillation-type density meters. These density meters are used by most of the metrology institutes for their calibration and scientific work. The aim of this project was to compare the results of the liquid density determination by oscillating density meters of the participating laboratories. The results were linked to CCM.D.K-2 partly via Project EURAMET.M.D.K-2 (1019) "Comparison of liquid density standards" by hydrostatic weighing piloted by BEV in 2008. In this comparison pentadecane, water and of oil with a high viscosity were measured at atmospheric pressure using oscillation type density meter. The temperature range was from 15 °C to 40 °C. The measurement results were in some cases discrepant. Further studies, comparisons are essential to explore the capability and uncertainty of the density meters Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Evaluation of uncertainty in the adjustment of fundamental constants

NASA Astrophysics Data System (ADS)

Bodnar, Olha; Elster, Clemens; Fischer, Joachim; Possolo, Antonio; Toman, Blaza

2016-02-01

Combining multiple measurement results for the same quantity is an important task in metrology and in many other areas. Examples include the determination of fundamental constants, the calculation of reference values in interlaboratory comparisons, or the meta-analysis of clinical studies. However, neither the GUM nor its supplements give any guidance for this task. Various approaches are applied such as weighted least-squares in conjunction with the Birge ratio or random effects models. While the former approach, which is based on a location-scale model, is particularly popular in metrology, the latter represents a standard tool used in statistics for meta-analysis. We investigate the reliability and robustness of the location-scale model and the random effects model with particular focus on resulting coverage or credible intervals. The interval estimates are obtained by adopting a Bayesian point of view in conjunction with a non-informative prior that is determined by a currently favored principle for selecting non-informative priors. Both approaches are compared by applying them to simulated data as well as to data for the Planck constant and the Newtonian constant of gravitation. Our results suggest that the proposed Bayesian inference based on the random effects model is more reliable and less sensitive to model misspecifications than the approach based on the location-scale model.

Dynamic alignment, tolerances, and metrology fundamentals at the nano and micro scales

NASA Astrophysics Data System (ADS)

Silberman, Donn M.

2015-09-01

Although the terms "micropositioning" and "nanopositioning" refer to different classes of positioning systems, "nanopositioning" is often used mistakenly to describe micropositioning systems. Micropositioning systems are typically motor-driven stages with travel ranges of a few millimeters up to a few hundred millimeters. Because the guiding systems in such stages — usually bearings of some kind — generate frictional forces, their resolution and repeatability are typically limited to 0.1 μm. The guiding system working principle also adds errors that are typically in the micrometer range. Nanopositioning systems are typically based on frictionless drives and guiding systems such as piezo actuators and flexures. These systems can achieve resolutions and guiding accuracies down to the sub-nanometer level. Both of these classes of precision positioning and motion systems are used extensively in precision optical and photonic systems to achieve desired performance specifications of instruments and experimental research projects. Currently, many precision positioning and motion systems have been design and implemented to cross over from the micro to the nano ranges with excellent results. This paper will describe some of the fundamental performance parameters and tolerances typical of these systems, some of the metrology used to confirm specifications and a few high end applications of general interest.

Final report on the regional supplementary comparison APMP.AUV.A-S1

NASA Astrophysics Data System (ADS)

Plangsangmas, Virat; Leeudomwong, Surat; Scott, Andrew; Zhong, Bo; Huang, Yuchung

2014-01-01

A regional supplementary comparison APMP.AUV.A-S1 has been carried out for the measurement of sound pressure level, frequency and total distortion of a multi-frequency sound calibrator. The role of the Pilot laboratory was undertaken by the National Institute of Metrology (Thailand) (NIMT). The multi-frequency sound calibrator was circulated through thirteen National Metrology Institutes (NMIs). Two NMIs were added to the original time schedule after starting the circulation. The measurements took place between September 2008 and July 2010. This report includes the measurement results from all the participants. Supplementary Comparison Reference Values (SCRVs) have been determined from the results. Deviations from the SCRVs are mostly within declared expanded uncertainties. It has been found that a term for the inherent instability in this type of device needs to be included in any uncertainty budget, and a recommended minimum value of this has been given. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCAUV, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Asynchronous reference frame agreement in a quantum network

NASA Astrophysics Data System (ADS)

Islam, Tanvirul; Wehner, Stephanie

2016-03-01

An efficient implementation of many multiparty protocols for quantum networks requires that all the nodes in the network share a common reference frame. Establishing such a reference frame from scratch is especially challenging in an asynchronous network where network links might have arbitrary delays and the nodes do not share synchronised clocks. In this work, we study the problem of establishing a common reference frame in an asynchronous network of n nodes of which at most t are affected by arbitrary unknown error, and the identities of the faulty nodes are not known. We present a protocol that allows all the correctly functioning nodes to agree on a common reference frame as long as the network graph is complete and not more than t\\lt n/4 nodes are faulty. As the protocol is asynchronous, it can be used with some assumptions to synchronise clocks over a network. Also, the protocol has the appealing property that it allows any existing two-node asynchronous protocol for reference frame agreement to be lifted to a robust protocol for an asynchronous quantum network.

High stability lasers for lidar and remote sensing

NASA Astrophysics Data System (ADS)

Heine, Frank; Lange, Robert; Seel, Stefan; Smutny, Berry

2017-11-01

Tesat-Spacecom is currently building a set flight models of frequency stabilized lasers for the ESA Missions AEOLUS and LTP. Lasers with low intensity noise in the kHz region and analogue tuning capabilities for frequency and output power are developed for the on board metrology of the LTP project, the precursor mission for LISA. This type of laser is internally stabilized by precise temperature control, approaching an ALLAN variance of 10-9 for 100 sec. It can be easily locked to external frequency references with <50kHz bandwidth. The Seed laser for the AEOLUS mission (wind LIDAR) is used as the master frequency reference and is stabilized internally by a optical cavity. It shows a 3* 10-11 Allan variance from time intervals 1 sec - 1000 sec. Furthermore it is step-tunable for calibration of the receiver instrument with a speed of GHz / sec by a digital command interface. Performance and environmental test results will be presented.

Digital terrain modelling and industrial surface metrology - Converging crafts

USGS Publications Warehouse

Pike, R.J.

2001-01-01

Quantitative characterisation of surface form, increasingly from digital 3-D height data, is cross-disciplinary and can be applied at any scale. Thus, separation of industrial-surface metrology from its Earth-science counterpart, (digital) terrain modelling, is artificial. Their growing convergence presents an opportunity to develop in surface morphometry a unified approach to surface representation. This paper introduces terrain modelling and compares it with metrology, noting their differences and similarities. Examples of potential redundancy among parameters illustrate one of the many issues common to both disciplines. ?? 2001 Elsevier Science Ltd. All rights reserved.

NASA metrology and calibration, 1993

NASA Technical Reports Server (NTRS)

1993-01-01

Th sixteenth annual workshop of NASA's Metrology and Calibration Working Group was held April 20-22, 1993. The goals of the Working Group are to provide Agencywide standardization of individual metrology programs, where appropriate; to promote cooperation and exchange of information within NASA, with other Government agencies, and with industry; to serve as the primary Agency interface with the National Institute of Standards and Technology; and to encourage formal quality control techniques such as Measurement Assurance Programs. These proceedings contain unedited reports and presentations from the workshop and are provided for information only.

In-situ sensing using mass spectrometry and its use for run-to-run control on a W-CVD cluster tool

NASA Astrophysics Data System (ADS)

Gougousi, T.; Sreenivasan, R.; Xu, Y.; Henn-Lecordier, L.; Rubloff, G. W.; Kidder, , J. N.; Zafiriou, E.

2001-01-01

A 300 amu closed-ion-source RGA (Leybold-Inficon Transpector 2) sampling gases directly from the reactor of an ULVAC ERA-1000 cluster tool has been used for real time process monitoring of a W CVD process. The process involves H2 reduction of WF6 at a total pressure of 67 Pa (0.5 torr) to produce W films on Si wafers heated at temperatures around 350 °C. The normalized RGA signals for the H2 reagent depletion and the HF product generation were correlated with the W film weight as measured post-process with an electronic microbalance for the establishment of thin-film weight (thickness) metrology. The metrology uncertainty (about 7% for the HF product) was limited primarily by the very low conversion efficiency of the W CVD process (around 2-3%). The HF metrology was then used to drive a robust run-to-run control algorithm, with the deposition time selected as the manipulated (or controlled) variable. For that purpose, during a 10 wafer run, a systematic process drift was introduced as a -5 °C processing temperature change for each successive wafer, in an otherwise unchanged process recipe. Without adjustment of the deposition time the W film weight (thickness) would have declined by about 50% by the 10th wafer. With the aid of the process control algorithm, an adjusted deposition time was computed so as to maintain constant HF sensing signal, resulting in weight (thickness) control comparable to the accuracy of the thickness metrology. These results suggest that in-situ chemical sensing, and particularly mass spectrometry, provide the basis for wafer state metrology as needed to achieve run-to-run control. Furthermore, since the control accuracy was consistent with the metrology accuracy, we anticipate significant improvements for processes as used in manufacturing, where conversion rates are much higher (40-50%) and corresponding signals for metrology will be much larger.

On the detectability of the Lense-Thirring field from rotating laboratory masses using ring laser gyroscope interferometers

NASA Astrophysics Data System (ADS)

Stedman, G. E.; Schreiber, K. U.; Bilger, H. R.

2003-07-01

The possibility of detecting the Lense-Thirring field generated by the rotating earth (also rotating laboratory masses) is reassessed in view of recent dramatic advances in the technology of ring laser gyroscopes. This possibility is very much less remote than it was a decade ago. The effect may contribute significantly to the Sagnac frequency of planned instruments. Its discrimination and detection will require an improved metrology, linking the ring to the celestial reference frame, and a fuller study of dispersion- and backscatter-induced frequency pulling. Both these requirements have been the subject of recent major progress, and our goal looks feasible.

Improving applied roughness measurement of involute helical gears

NASA Astrophysics Data System (ADS)

Koulin, G.; Zhang, J.; Frazer, R. C.; Wilson, S. J.; Shaw, B. A.

2017-12-01

With improving gear design and manufacturing technology, improvement in metrology is necessary to provide reliable feedback to the designer and manufacturer. A recommended gear roughness measurement method is applied to a micropitting contact fatigue test gear. The development of wear and micropitting is reliably characterised at the sub-micron roughness level. Changes to the features of the localised surface texture are revealed and are related to key gear meshing positions. The application of the recommended methodology is shown to provide informative feedback to the gear designer in reference to the fundamental gear coordinate system, which is used in gear performance simulations such as tooth contact analysis.

Requirements for data integration platforms in biomedical research networks: a reference model.

PubMed

Ganzinger, Matthias; Knaup, Petra

2015-01-01

Biomedical research networks need to integrate research data among their members and with external partners. To support such data sharing activities, an adequate information technology infrastructure is necessary. To facilitate the establishment of such an infrastructure, we developed a reference model for the requirements. The reference model consists of five reference goals and 15 reference requirements. Using the Unified Modeling Language, the goals and requirements are set into relation to each other. In addition, all goals and requirements are described textually in tables. This reference model can be used by research networks as a basis for a resource efficient acquisition of their project specific requirements. Furthermore, a concrete instance of the reference model is described for a research network on liver cancer. The reference model is transferred into a requirements model of the specific network. Based on this concrete requirements model, a service-oriented information technology architecture is derived and also described in this paper.

NPL scoops £25m for advanced metrology centre

NASA Astrophysics Data System (ADS)

Singh Chadha, Kulvinder

2013-03-01

The National Physical Laboratory (NPL) in Teddington, UK, is to receive £25m towards the construction of an Advanced Metrology Laboratory (AML) that will contain up to 20 labs and be complete by 2017.

Technique for the metrology calibration of a Fourier transform spectrometer

DOE Office of Scientific and Technical Information (OSTI.GOV)

Spencer, Locke D.; Naylor, David A

2008-11-10

A method is presented for using a Fourier transform spectrometer (FTS) to calibrate the metrology of a second FTS. This technique is particularly useful when the second FTS is inside a cryostat or otherwise inaccessible.

Combined dry plasma etching and online metrology for manufacturing highly focusing x-ray mirrors

DOE Office of Scientific and Technical Information (OSTI.GOV)

Berujon, S., E-mail: berujon@esrf.eu; Ziegler, E., E-mail: ziegler@esrf.eu; Cunha, S. da

A new figuring station was designed and installed at the ESRF beamline BM05. It allows the figuring of mirrors within an iterative process combining the advantage of online metrology with dry etching. The complete process takes place under a vacuum environment to minimize surface contamination while non-contact surfacing tools open up the possibility of performing at-wavelength metrology and eliminating placement errors. The aim is to produce mirrors whose slopes do not deviate from the stigmatic profile by more than 0.1 µrad rms while keeping surface roughness in the acceptable limit of 0.1-0.2 nm rms. The desired elliptical mirror surface shapemore » can be achieved in a few iterations in about a one day time span. This paper describes some of the important aspects of the process regarding both the online metrology and the etching process.« less

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kalavapudi, M.; Iyengar, V.

Increased industrial activities in developing countries have degraded the environment, and the impact on the environment is further magnified because of an ever-increasing population, the prime receptors. Independent of the geographical location, it is possible to adopt effective strategies to solve environmental problems. In the United States, waste characterization and remediation practices are commonly used for quantifying toxic contaminants in air, water, and soil. Previously, such procedures were extraneous, ineffective, and cost-intensive. Reconciliation between the government and stakeholders, reinforced by valid data analysis and environmental exposure assessments, has allowed the {open_quotes}Brownfields{close_quotes} to be a successful approach. Certified reference materials andmore » standard reference materials from the National Institute of Standards (NIST) are indispensable tools for solving environmental problems and help to validate data quality and the demands of legal metrology. Certified reference materials are commonly available, essential tools for developing good quality secondary and in-house reference materials that also enhance analytical quality. This paper cites examples of environmental conditions in developing countries, i.e., industrial pollution problems in India, polluted beaches in Brazil, and deteriorating air quality in countries, such as Korea, China, and Japan. The paper also highlights practical and effective approaches for remediating these problems. 23 refs., 7 figs., 1 tab.« less

Development of new reference material neohesperidin for quality control of dietary supplements.

PubMed

Gong, Ningbo; Zhang, Baoxi; Yang, Dezhi; Gao, Zhaolin; Du, Guanhua; Lu, Yang

2015-07-01

Neohesperidin is an important natural flavanone glycoside distributed in several citrus species. This compound is widely used as a raw material for food additives in the food industry. The request for certified reference materials (CRMs) in dietary supplements was stipulated by the National Administrative Committee for CRMs and was underpinned by the need to improve the accuracy and comparability of measurement data and to establish metrological traceability of analytical results. This paper reports the sample preparation methodology, homogeneity and stability studies, value assignment and uncertainty estimation of a new certified reference material of neohesperidin (GBW09522). Differential scanning calorimetry, coulometric titration and mass balance methods proved to be sufficiently reliable and accurate for certification purposes. The certified value of neohesperidin CRM is 994 g kg(-1) with an expanded uncertainty of 4 g kg(-1) (k = 2). The reference material described above was homogeneous and stable for 12 months at a storage temperature of 25 °C. The new CRM of neohesperidin can be used to validate analytical methods and improve the accuracy of measurement data as well as quality control of neohesperidin-related dietary supplements, foods, traditional herbs and pharmaceutical formulations. © 2014 Society of Chemical Industry.

Metrology requirements for the serial production of ELT primary mirror segments

NASA Astrophysics Data System (ADS)

Rees, Paul C. T.; Gray, Caroline

2015-08-01

The manufacture of the next generation of large astronomical telescopes, the extremely large telescopes (ELT), requires the rapid manufacture of greater than 500 1.44m hexagonal segments for the primary mirror of each telescope. Both leading projects, the Thirty Meter Telescope (TMT) and the European Extremely Large Telescope (E-ELT), have set highly demanding technical requirements for each fabricated segment. These technical requirements, when combined with the anticipated construction schedule for each telescope, suggest that more than one optical fabricator will be involved in the delivery of the primary mirror segments in order to meet the project schedule. For one supplier, the technical specification is challenging and requires highly consistent control of metrology in close coordination with the polishing technologies used in order to optimize production rates. For production using multiple suppliers, however the supply chain is structured, consistent control of metrology along the supply chain will be required. This requires a broader pattern of independent verification than is the case of a single supplier. This paper outlines the metrology requirements for a single supplier throughout all stages of the fabrication process. We identify and outline those areas where metrology accuracy and duration have a significant impact on production efficiency. We use the challenging ESO E-ELT technical specification as an example of our treatment, including actual process data. We further develop this model for the case of a supply chain consisting of multiple suppliers. Here, we emphasize the need to control metrology throughout the supply chain in order to optimize net production efficiency.

High throughput wafer defect monitor for integrated metrology applications in photolithography

NASA Astrophysics Data System (ADS)

Rao, Nagaraja; Kinney, Patrick; Gupta, Anand

2008-03-01

The traditional approach to semiconductor wafer inspection is based on the use of stand-alone metrology tools, which while highly sensitive, are large, expensive and slow, requiring inspection to be performed off-line and on a lot sampling basis. Due to the long cycle times and sparse sampling, the current wafer inspection approach is not suited to rapid detection of process excursions that affect yield. The semiconductor industry is gradually moving towards deploying integrated metrology tools for real-time "monitoring" of product wafers during the manufacturing process. Integrated metrology aims to provide end-users with rapid feedback of problems during the manufacturing process, and the benefit of increased yield, and reduced rework and scrap. The approach of monitoring 100% of the wafers being processed requires some trade-off in sensitivity compared to traditional standalone metrology tools, but not by much. This paper describes a compact, low-cost wafer defect monitor suitable for integrated metrology applications and capable of detecting submicron defects on semiconductor wafers at an inspection rate of about 10 seconds per wafer (or 360 wafers per hour). The wafer monitor uses a whole wafer imaging approach to detect defects on both un-patterned and patterned wafers. Laboratory tests with a prototype system have demonstrated sensitivity down to 0.3 µm on un-patterned wafers and down to 1 µm on patterned wafers, at inspection rates of 10 seconds per wafer. An ideal application for this technology is preventing photolithography defects such as "hot spots" by implementing a wafer backside monitoring step prior to exposing wafers in the lithography step.

Metrology to quantify wear and creep of polyethylene tibial knee inserts.

PubMed

Muratoglu, Orhun K; Perinchief, Rebecca S; Bragdon, Charles R; O'Connor, Daniel O; Konrad, Reto; Harris, William H

2003-05-01

Assessment of damage on articular surfaces of ultrahigh molecular weight polyethylene tibial knee inserts primarily has been limited to qualitative methods, such as visual observation and classification of features such as pitting, delamination, and subsurface cracking. Semiquantitative methods also have been proposed to determine the linear penetration and volume of the scar that forms on articular surfaces of tibial knee inserts. The current authors report a new metrologic method that uses a coordinate measuring machine to quantify the dimensions of this scar. The articular surface of the insert is digitized with the coordinate measuring machine before and after regular intervals of testing on a knee simulator. The volume and linear penetration of the scar are calculated by mathematically taking the difference between the digitized surface maps of the worn and unworn articular surfaces. Three conventional polyethylene tibial knee inserts of a posterior cruciate-sparing design were subjected to five million cycles of normal gait on a displacement-driven knee wear simulator in bovine serum. A metrologic method was used to calculate creep and wear contributions to the scar formation on each tibial plateau. Weight loss of the inserts was determined gravimetrically with the appropriate correction for fluid absorption. The total average wear volume was 43 +/- 9 and 41 +/- 4 mm3 measured by the metrologic and gravimetric methods, respectively. The wear rate averaged 8.3 +/- 0.9 and 8.5 +/- 1.6 mm3 per million cycles measured by the metrologic and gravimetric methods, respectively. These comparisons reflected strong agreement between the metrologic and gravimetric methods.

Laser modulator for LISA pathfinder

NASA Astrophysics Data System (ADS)

Voland, C.; Lund, G.; Coppoolse, W.; Crosby, P.; Stadler, M.; Kudielka, K.; Özkan, C.

2017-11-01

LISA Pathfinder is an ESA experiment to demonstrate the key technologies needed for the LISA mission to detect gravitational waves in space. The LISA Pathfinder spacecraft represents one arm of the LISA interferometer, containing an optical metrology system and two proof masses as inertial references for the drag-free control system. The LISA Pathfinder payload consists of two drag-free floating test masses located in the inertial sensors with their control electronics and an optical metrology subsystem. The optical metrology subsystem monitors the movement of both test masses relative to each other and to the spacecraft with very high sensitivity and resolution. This is achieved with a heterodyne Mach- Zehnder interferometer. This interferometer requires as input two coherent laser beams with a heterodyne frequency difference of a few kHz. To generate the two laser beams with a heterodyne frequency difference a Nd:YAG laser is used together with the Laser Modulator. The Nd:YAG laser generates a single coherent laser signal at a wavelength of 1064nm which is fibre coupled to the Laser Modulator. The Laser Modulator then generates the two optical beams with the required heterodyne frequency offset. In addition, the Laser Modulator is required to perform laser amplitude stabilization and optical path difference control for the two optical signals. The Laser Modulator consists of an optical unit - the LMU - and RF synthesiser, power amplification and control electronics. These electronics are all housed in the Laser Modulator Electronics (LME). The LMU has four primary functions: • Splitting of the input laser beam into two paths for later superposition in the interferometer. • Applying different frequency shifts to each of the beams. • Providing amplitude modulation control to each of the beams. • Providing active control of the optical path length difference between the two optical paths. The present paper describes the design and performance of the LMU together with a summary of the results of the Laser Modulator engineering model test campaign.

Cellulose nanocrystals the next big nano-thing?

NASA Astrophysics Data System (ADS)

Postek, Michael T.; Vladar, Andras; Dagata, John; Farkas, Natalia; Ming, Bin; Sabo, Ronald; Wegner, Theodore H.; Beecher, James

2008-08-01

Biomass surrounds us from the smallest alga to the largest redwood tree. Even the largest trees owe their strength to a newly-appreciated class of nanomaterials known as cellulose nanocrystals (CNC). Cellulose, the world's most abundant natural, renewable, biodegradable polymer, occurs as whisker like microfibrils that are biosynthesized and deposited in plant material in a continuous fashion. Therefore, the basic raw materials for a future of new nanomaterials breakthroughs already abound in the environment and are available to be utilized in an array of future materials once the manufacturing processes and nanometrology are fully developed. This presentation will discuss some of the instrumentation, metrology and standards issues associated with nanomanufacturing of cellulose nanocrystals. The use of lignocellulosic fibers derived from sustainable, annually renewable resources as a reinforcing phase in polymeric matrix composites provides positive environmental benefits with respect to ultimate disposability and raw material use. Today we lack the essential metrology infrastructure that would enable the manufacture of nanotechnology-based products based on CNCs (or other new nanomaterial) to significantly impact the U.S. economy. The basic processes common to manufacturing - qualification of raw materials, continuous synthesis methods, process monitoring and control, in-line and off-line characterization of product for quality control purposes, validation by standard reference materials - are not generally in place for nanotechnology based products, and thus are barriers to innovation. One advantage presented by the study of CNCs is that, unlike other nanomaterials, at least, cellulose nanocrystal manufacturing is already a sustainable and viable bulk process. Literally tons of cellulose nanocrystals can be generated each day, producing other viable byproducts such as glucose (for alternative fuel) and gypsum (for buildings).There is an immediate need for the development of the basic manufacturing metrology infrastructure to implement fundamental best practices for manufacturing and in the determination of properties for these for nanoscale materials and the resultant products.

Through-focus scanning optical microscopy (TSOM) with adaptive optics

NASA Astrophysics Data System (ADS)

Lee, Jun Ho; Park, Gyunam; Jeong, Junhee; Park, Chris

2018-03-01

Through-focus optical microscopy (TSOM) with nanometer-scale lateral and vertical sensitivity levels matching those of scanning electron microscopy has been demonstrated to be useful both for 3D inspections and metrology assessments. In 2014, funded by two private companies (Nextin/Samsung Electronics) and the Korea Evaluation Institute of Industrial Technology (KEIT), a research team from four universities in South Korea set out to investigate core technologies for developing in-line TSOM inspection and metrology tools, with the respective teams focusing on optics implementation, defect inspection, computer simulation and high-speed metrology matching. We initially confirmed the reported validity of the TSOM operation through a computer simulation, after which we implemented the TSOM operation by throughfocus scanning of existing UV (355nm) and IR (800nm) inspection tools. These tools have an identical sampling distance of 150 nm but have different resolving distances (310 and 810 nm, respectively). We initially experienced some improvement in the defect inspection sensitivity level over TSV (through-silicon via) samples with 6.6 μm diameters. However, during the experiment, we noted sensitivity and instability issues when attempting to acquire TSOM images. As TSOM 3D information is indirectly extracted by differentiating a target TSOM image from reference TSOM images, any instability or mismatch in imaging conditions can result in measurement errors. As a remedy to such a situation, we proposed the application of adaptive optics to the TSOM operation and developed a closed-loop system with a tip/tilt mirror and a Shack-Hartmann sensor on an optical bench. We were able to keep the plane position within in RMS 0.4 pixel by actively compensating for any position instability which arose during the TSOM scanning process along the optical axis. Currently, we are also developing another TSOM tool with a deformable mirror instead of a tip/tilt mirror, in which case we will not require any mechanical scanning.

Optical characterisation of three reference Dobsons in the ATMOZ Project - verification of G. M. B. Dobson's original specifications

NASA Astrophysics Data System (ADS)

Köhler, Ulf; Nevas, Saulius; McConville, Glen; Evans, Robert; Smid, Marek; Stanek, Martin; Redondas, Alberto; Schönenborn, Fritz

2018-04-01

Three reference Dobsons (regional standard Dobsons No. 064, Germany and No. 074, Czech Republic as well as the world standard No. 083, USA) were optically characterized at the Physikalisch-Technische Bundesanstalt (PTB) in Braunschweig in 2015 and at the Czech Metrology Institute (CMI) in Prague in 2016 within the EMRP ENV 059 project Traceability for atmospheric total column ozone. Slit functions and the related parameters of the instruments were measured and compared with G. M. B. Dobson's specifications in his handbook. All Dobsons show a predominantly good match of the slit functions and the peak (centroid) wavelengths with deviations between -0.11 and +0.12 nm and differences of the full width half maximum (FWHM) between 0.13 and 0.37 nm compared to the nominal values at the shorter wavelengths. Slightly larger deviations of the FWHMs from the nominal Dobson data, up to 1.22 nm, can be seen at the longer wavelengths, especially for the slit function of the long D-wavelength. However, differences between the effective absorption coefficients (EACs) for ozone derived using Dobson's nominal values of the optical parameters on one hand and these measured values on the other hand are not too large in the case of both old Bass-Paur (BP) and new IUP-ozone (Institut für Umweltphysik, University of Bremen) absorption cross sections. Their inclusion in the calculation of the total ozone column (TOC) leads to improvements of significantly less than ±1 % at the AD-wavelengths between -1 and -2 % at the CD-wavelengths pairs in the BP-scale. The effect on the TOC in the IUP-scale is somewhat larger at the AD-wavelengths, up to +1 % (D074), and smaller at the CD-wavelengths pair, from -0.44 to -1.5 %. Beside this positive effect gained from the data with higher metrological quality that is needed for trend analyses and satellite validation, it will be also possible to explain uncommon behaviours of field Dobsons during calibration services, especially when a newly developed transportable device TuPS (tuneable portable radiation source) from CMI proves its capability to provide similar results as the stationary setups in the laboratories of National Metrology Institutes. Then, the field Dobsons can be optically characterized as well during regular calibration campaigns. A corresponding publication will be prepared using the results of TuPS-based measurements of more than 10 Dobsons in field campaigns in 2017.

Absolute optical metrology : nanometers to kilometers

NASA Technical Reports Server (NTRS)

Dubovitsky, Serge; Lay, O. P.; Peters, R. D.; Liebe, C. C.

2005-01-01

We provide and overview of the developments in the field of high-accuracy absolute optical metrology with emphasis on space-based applications. Specific work on the Modulation Sideband Technology for Absolute Ranging (MSTAR) sensor is described along with novel applications of the sensor.

Metrology laboratory requirements for third-generation synchrotron radiation sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Takacs, P.Z.; Quian, Shinan

1997-11-01

New third-generation synchrotron radiation sources that are now, or will soon, come on line will need to decide how to handle the testing of optical components delivered for use in their beam lines. In many cases it is desirable to establish an in-house metrology laboratory to do the work. We review the history behind the formation of the Optical Metrology Laboratory at Brookhaven National Laboratory and the rationale for its continued existence. We offer suggestions to those who may be contemplating setting up similar facilities, based on our experiences over the past two decades.

Metrological Reliability of Medical Devices

NASA Astrophysics Data System (ADS)

Costa Monteiro, E.; Leon, L. F.

2015-02-01

The prominent development of health technologies of the 20th century triggered demands for metrological reliability of physiological measurements comprising physical, chemical and biological quantities, essential to ensure accurate and comparable results of clinical measurements. In the present work, aspects concerning metrological reliability in premarket and postmarket assessments of medical devices are discussed, pointing out challenges to be overcome. In addition, considering the social relevance of the biomeasurements results, Biometrological Principles to be pursued by research and innovation aimed at biomedical applications are proposed, along with the analysis of their contributions to guarantee the innovative health technologies compliance with the main ethical pillars of Bioethics.

Metrology for decommissioning nuclear facilities: Partial outcomes of joint research project within the European Metrology Research Program.

PubMed

Suran, Jiri; Kovar, Petr; Smoldasova, Jana; Solc, Jaroslav; Van Ammel, Raf; Garcia Miranda, Maria; Russell, Ben; Arnold, Dirk; Zapata-García, Daniel; Boden, Sven; Rogiers, Bart; Sand, Johan; Peräjärvi, Kari; Holm, Philip; Hay, Bruno; Failleau, Guillaume; Plumeri, Stephane; Laurent Beck, Yves; Grisa, Tomas

2018-04-01

Decommissioning of nuclear facilities incurs high costs regarding the accurate characterisation and correct disposal of the decommissioned materials. Therefore, there is a need for the implementation of new and traceable measurement technologies to select the appropriate release or disposal route of radioactive wastes. This paper addresses some of the innovative outcomes of the project "Metrology for Decommissioning Nuclear Facilities" related to mapping of contamination inside nuclear facilities, waste clearance measurement, Raman distributed temperature sensing for long term repository integrity monitoring and validation of radiochemical procedures. Copyright © 2017 Elsevier Ltd. All rights reserved.

Albuquerque Regional Training: The Third Seminar on Surface Metrology for the Americas May 12-13 2014

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tran, Sophie M; Tran, Hy D.

The Third Seminar on Surface Metrology for the Americas (SSMA) took place in Albuquerque, New Mexico May 12-13, 2014. The conference was at the Marriott Hotel, in the heart of Albuquerque Uptown, within walking distance of many fantastic restaurants. Why surface metrology? Ask Professor Chris Brown of Worcester Polytechnic Institute (WPI), the chair of the first two SSMAs in 2011 and 2012 and the chair of the ASME B46 committee on classification and designation of surface qualities, and Professor Brown responds: “Because surfaces cover everything.”

In-Line Detection and Measurement of Molecular Contamination in Semiconductor Process Solutions

NASA Astrophysics Data System (ADS)

Wang, Jason; West, Michael; Han, Ye; McDonald, Robert C.; Yang, Wenjing; Ormond, Bob; Saini, Harmesh

2005-09-01

This paper discusses a fully automated metrology tool for detection and quantitative measurement of contamination, including cationic, anionic, metallic, organic, and molecular species present in semiconductor process solutions. The instrument is based on an electrospray ionization time-of-flight mass spectrometer (ESI-TOF/MS) platform. The tool can be used in diagnostic or analytical modes to understand process problems in addition to enabling routine metrology functions. Metrology functions include in-line contamination measurement with near real-time trend analysis. This paper discusses representative organic and molecular contamination measurement results in production process problem solving efforts. The examples include the analysis and identification of organic compounds in SC-1 pre-gate clean solution; urea, NMP (N-Methyl-2-pyrrolidone) and phosphoric acid contamination in UPW; and plasticizer and an organic sulfur-containing compound found in isopropyl alcohol (IPA). It is expected that these unique analytical and metrology capabilities will improve the understanding of the effect of organic and molecular contamination on device performance and yield. This will permit the development of quantitative correlations between contamination levels and process degradation. It is also expected that the ability to perform routine process chemistry metrology will lead to corresponding improvements in manufacturing process control and yield, the ability to avoid excursions and will improve the overall cost effectiveness of the semiconductor manufacturing process.

Absolute, pressure-dependent validation of a calibration-free, airborne laser hygrometer transfer standard (SEALDH-II) from 5 to 1200 ppmv using a metrological humidity generator

NASA Astrophysics Data System (ADS)

Buchholz, Bernhard; Ebert, Volker

2018-01-01

Highly accurate water vapor measurements are indispensable for understanding a variety of scientific questions as well as industrial processes. While in metrology water vapor concentrations can be defined, generated, and measured with relative uncertainties in the single percentage range, field-deployable airborne instruments deviate even under quasistatic laboratory conditions up to 10-20 %. The novel SEALDH-II hygrometer, a calibration-free, tuneable diode laser spectrometer, bridges this gap by implementing a new holistic concept to achieve higher accuracy levels in the field. We present in this paper the absolute validation of SEALDH-II at a traceable humidity generator during 23 days of permanent operation at 15 different H2O mole fraction levels between 5 and 1200 ppmv. At each mole fraction level, we studied the pressure dependence at six different gas pressures between 65 and 950 hPa. Further, we describe the setup for this metrological validation, the challenges to overcome when assessing water vapor measurements on a high accuracy level, and the comparison results. With this validation, SEALDH-II is the first airborne, metrologically validated humidity transfer standard which links several scientific airborne and laboratory measurement campaigns to the international metrological water vapor scale.

Challenges in the size analysis of a silica nanoparticle mixture as candidate certified reference material

NASA Astrophysics Data System (ADS)

Kestens, Vikram; Roebben, Gert; Herrmann, Jan; Jämting, Åsa; Coleman, Victoria; Minelli, Caterina; Clifford, Charles; De Temmerman, Pieter-Jan; Mast, Jan; Junjie, Liu; Babick, Frank; Cölfen, Helmut; Emons, Hendrik

2016-06-01

A new certified reference material for quality control of nanoparticle size analysis methods has been developed and produced by the Institute for Reference Materials and Measurements of the European Commission's Joint Research Centre. The material, ERM-FD102, consists of an aqueous suspension of a mixture of silica nanoparticle populations of distinct particle size and origin. The characterisation relied on an interlaboratory comparison study in which 30 laboratories of demonstrated competence participated with a variety of techniques for particle size analysis. After scrutinising the received datasets, certified and indicative values for different method-defined equivalent diameters that are specific for dynamic light scattering (DLS), centrifugal liquid sedimentation (CLS), scanning and transmission electron microscopy (SEM and TEM), atomic force microscopy (AFM), particle tracking analysis (PTA) and asymmetrical-flow field-flow fractionation (AF4) were assigned. The value assignment was a particular challenge because metrological concepts were not always interpreted uniformly across all participating laboratories. This paper presents the main elements and results of the ERM-FD102 characterisation study and discusses in particular the key issues of measurand definition and the estimation of measurement uncertainty.

Preparation and certification of arsenate [As(V)] reference material, NMIJ CRM 7912-a.

PubMed

Narukawa, Tomohiro; Kuroiwa, Takayoshi; Narushima, Izumi; Jimbo, Yasujiro; Suzuki, Toshihiro; Chiba, Koichi

2010-05-01

Arsenate [As(V)] solution reference material, National Metrology Institute of Japan (NMIJ) certified reference material (CRM) 7912-a, for speciation of arsenic species was developed and certified by NMIJ, the National Institute of Advanced Industrial Science and Technology. High-purity As(2)O(3) reagent powder was dissolved in 0.8 M HNO(3) solution and As(III) was oxidized to As(V) with HNO(3) to prepare 100 mg kg(-1) of As(V) candidate CRM solution. The solution was bottled in 400 bottles (50 mL each). The concentration of As(V) was determined by four independent analytical techniques-inductively coupled plasma mass spectrometry, inductively coupled plasma optical emission spectrometry, graphite furnace atomic absorption spectrometry, and liquid chromatography inductively coupled plasma mass spectrometry-according to As(V) calibration solutions, which were prepared from the arsenic standard of the Japan Calibration Service system and whose species was guaranteed to be As(V) by NMIJ. The uncertainties of all the measurements and preparation procedures were evaluated. The certified value of As(V) in the CRM is (99.53 +/- 1.67) mg kg(-1) (k = 2).

The First Geodetic VLBI Field Test of LIFT: A 550-km-long Optical Fiber Link for Remote Antenna Synchronization

NASA Astrophysics Data System (ADS)

Perini, Federico; Bortolotti, Claudio; Roma, Mauro; Ambrosini, Roberto; Negusini, Monia; Maccaferri, Giuseppe; Stagni, Matteo; Nanni, Mauro; Clivati, Cecilia; Frittelli, Matteo; Mura, Alberto; Levi, Filippo; Zucco, Massimo; Calonico, Davide; Bertarini, Alessandra; Artz, Thomas

2016-12-01

We present the first field test of the implementation of a coherent optical fiber link for remote antenna synchronization realized in Italy between the Italian Metrological Institute (INRIM) and the Medicina radio observatory of the National Institute for Astrophysics (INAF). The Medicina VLBI antenna participated in the EUR137 experiment carried out in September 2015 using, as reference systems, both the local H-maser and a remote H-maser hosted at the INRIM labs in Turin, separated by about 550 km. In order to assess the quality of the remote clock, the observed radio sources were split into two sets, using either the local or the remote H-maser. A system to switch automatically between the two references was integrated into the antenna field system. The observations were correlated in Bonn and preliminary results are encouraging since fringes were detected with both time references along the full 24 hours of the session. The experimental set-up, the results, and the perspectives for future radio astronomical and geodetic experiments are presented.

Phase Synchronization for the Mid-Frequency Square Kilometre Array Telescope

NASA Astrophysics Data System (ADS)

Schediwy, Sascha; Gozzard, David; Stobie, Simon; Gravestock, Charles; Whitaker, Richard; Alachkar, Bassem; Malan, Sias; Boven, Paul; Grainge, Keith

2018-01-01

The Square Kilometre Array (SKA) project is an international effort to build the world’s most sensitive radio telescope operating in the 50 MHz to 14 GHz frequency range. Construction of the SKA has been divided into phases, with the first phase (SKA1) accounting for the first 10% of the telescope's receiving capacity. During SKA1, a low-frequency aperture array comprising over a hundred thousand individual dipole antenna elements will be constructed in Western Australia (SKA1-low), while an array of 197 parabolic-dish antennas, incorporating the 64 dishes of MeerKAT, will be constructed in South Africa (SKA1-mid).Radio telescope arrays such as the SKA require phase-coherent reference signals to be transmitted to each antenna site in the array. In the case of the SKA1-mid, these reference signals will be generated at a central site and transmitted to the antenna sites via fiber-optic cables up to 175 km in length. Environmental perturbations affect the optical path length of the fiber and act to degrade the phase stability of the reference signals received at the antennas, which has the ultimate effect of reducing the fidelity and dynamic range of the data.Since 2011, researchers at the University of Western Australia (UWA) have led the development of an actively-stabilized phase-synchronization system designed specifically to meet the scientific needs and technical challenges of the SKA telescope. Recently this system has been select as the official phase synchronization system for the SKA1-mid telescope. The system is an evolution of Atacama Large Millimeter Array’s distributed ‘photonic local oscillator system’, incorporating key advances made by the international frequency metrology community over the last decade, as well as novel innovations developed by UWA researchers.In this presentation I will describe the technical details of the system; outline how the system's performance was tested using metrology techniques in a laboratory setting, on 186 km of overhead fibre at the South African SKA site, and verified using existing astronomical radio interferometers; and how the system can enhance the astronomical performance of the SKA1-mid telescope.

Biophysical characterization and structure of the Fab fragment from the NIST reference antibody, RM 8671.

PubMed

Karageorgos, Ioannis; Gallagher, Elyssia S; Galvin, Connor; Gallagher, D Travis; Hudgens, Jeffrey W

2017-11-01

Monoclonal antibody pharmaceuticals are the fastest-growing class of therapeutics, with a wide range of clinical applications. To assure their safety, these protein drugs must demonstrate highly consistent purity and stability. Key to these objectives is higher order structure measurements validated by calibration to reference materials. We describe preparation, characterization, and crystal structure of the Fab fragment prepared from the NIST Reference Antibody RM 8671 (NISTmAb). NISTmAb is a humanized IgG1κ antibody, produced in murine cell culture and purified by standard biopharmaceutical production methods, developed at the National Institute of Standards and Technology (NIST) to serve as a reference material. The Fab fragment was derived from NISTmAb through papain cleavage followed by protein A based purification. The purified Fab fragment was characterized by SDS-PAGE, capillary gel electrophoresis, multi-angle light scattering, size exclusion chromatography, mass spectrometry, and x-ray crystallography. The crystal structure at 0.2 nm resolution includes four independent Fab molecules with complete light chains and heavy chains through Cys 223, enabling assessment of conformational variability and providing a well-characterized reference structure for research and engineering applications. This nonproprietary, publically available reference material of known higher-order structure can support metrology in biopharmaceutical applications, and it is a suitable platform for validation of molecular modeling studies. Published by Elsevier Ltd.

Requirements for data integration platforms in biomedical research networks: a reference model

PubMed Central

Knaup, Petra

2015-01-01

Biomedical research networks need to integrate research data among their members and with external partners. To support such data sharing activities, an adequate information technology infrastructure is necessary. To facilitate the establishment of such an infrastructure, we developed a reference model for the requirements. The reference model consists of five reference goals and 15 reference requirements. Using the Unified Modeling Language, the goals and requirements are set into relation to each other. In addition, all goals and requirements are described textually in tables. This reference model can be used by research networks as a basis for a resource efficient acquisition of their project specific requirements. Furthermore, a concrete instance of the reference model is described for a research network on liver cancer. The reference model is transferred into a requirements model of the specific network. Based on this concrete requirements model, a service-oriented information technology architecture is derived and also described in this paper. PMID:25699205

[Application of near-infrared spectroscopy to agriculture and food analysis].

PubMed

Wang, Duo-jia; Zhou, Xiang-yang; Jin, Tong-ming; Hu, Xiang-na; Zhong, Jiao-e; Wu, Qi-tang

2004-04-01

Near-Infrared Spectroscopy (NIRS) is the most rapidly developing and the most noticeable spectrographic technique in the 90's (the last century). Its principle and characteristics were explained in this paper, and the development of NIRS instrumentation, the methodology of spectrum pre-processing, as well as the chemical metrology were also introduced. The anthors mainly summarized the applications to agriculture and food, especially in-line analysis methods, which have been used in production procedure by fiber optics. The authors analyzed the NIRS application status in China, and made the first proposal to establish information sharing mode between central database and end-user by using network technology and concentrating valuable resources.

Advanced metrology by offline SEM data processing

NASA Astrophysics Data System (ADS)

Lakcher, Amine; Schneider, Loïc.; Le-Gratiet, Bertrand; Ducoté, Julien; Farys, Vincent; Besacier, Maxime

2017-06-01

Today's technology nodes contain more and more complex designs bringing increasing challenges to chip manufacturing process steps. It is necessary to have an efficient metrology to assess process variability of these complex patterns and thus extract relevant data to generate process aware design rules and to improve OPC models. Today process variability is mostly addressed through the analysis of in-line monitoring features which are often designed to support robust measurements and as a consequence are not always very representative of critical design rules. CD-SEM is the main CD metrology technique used in chip manufacturing process but it is challenged when it comes to measure metrics like tip to tip, tip to line, areas or necking in high quantity and with robustness. CD-SEM images contain a lot of information that is not always used in metrology. Suppliers have provided tools that allow engineers to extract the SEM contours of their features and to convert them into a GDS. Contours can be seen as the signature of the shape as it contains all the dimensional data. Thus the methodology is to use the CD-SEM to take high quality images then generate SEM contours and create a data base out of them. Contours are used to feed an offline metrology tool that will process them to extract different metrics. It was shown in two previous papers that it is possible to perform complex measurements on hotspots at different process steps (lithography, etch, copper CMP) by using SEM contours with an in-house offline metrology tool. In the current paper, the methodology presented previously will be expanded to improve its robustness and combined with the use of phylogeny to classify the SEM images according to their geometrical proximities.

Toward Advancing Nano-Object Count Metrology: A Best Practice Framework

PubMed Central

Boyko, Volodymyr; Meyers, Greg; Voetz, Matthias; Wohlleben, Wendel

2013-01-01

Background: A movement among international agencies and policy makers to classify industrial materials by their number content of sub–100-nm particles could have broad implications for the development of sustainable nanotechnologies. Objectives: Here we highlight current particle size metrology challenges faced by the chemical industry due to these emerging number percent content thresholds, provide a suggested best-practice framework for nano-object identification, and identify research needs as a path forward. Discussion: Harmonized methods for identifying nanomaterials by size and count for many real-world samples do not currently exist. Although particle size remains the sole discriminating factor for classifying a material as “nano,” inconsistencies in size metrology will continue to confound policy and decision making. Moreover, there are concerns that the casting of a wide net with still-unproven metrology methods may stifle the development and judicious implementation of sustainable nanotechnologies. Based on the current state of the art, we propose a tiered approach for evaluating materials. To enable future risk-based refinements of these emerging definitions, we recommend that this framework also be considered in environmental and human health research involving the implications of nanomaterials. Conclusion: Substantial scientific scrutiny is needed in the area of nanomaterial metrology to establish best practices and to develop suitable methods before implementing definitions based solely on number percent nano-object content for regulatory purposes. Strong cooperation between industry, academia, and research institutions will be required to fully develop and implement detailed frameworks for nanomaterial identification with respect to emerging count-based metrics. Citation: Brown SC, Boyko V, Meyers G, Voetz M, Wohlleben W. 2013. Toward advancing nano-object count metrology: a best practice framework. Environ Health Perspect 121:1282–1291; http://dx.doi.org/10.1289/ehp.1306957 PMID:24076973

DFM flow by using combination between design based metrology system and model based verification at sub-50nm memory device

NASA Astrophysics Data System (ADS)

Kim, Cheol-kyun; Kim, Jungchan; Choi, Jaeseung; Yang, Hyunjo; Yim, Donggyu; Kim, Jinwoong

2007-03-01

As the minimum transistor length is getting smaller, the variation and uniformity of transistor length seriously effect device performance. So, the importance of optical proximity effects correction (OPC) and resolution enhancement technology (RET) cannot be overemphasized. However, OPC process is regarded by some as a necessary evil in device performance. In fact, every group which includes process and design, are interested in whole chip CD variation trend and CD uniformity, which represent real wafer. Recently, design based metrology systems are capable of detecting difference between data base to wafer SEM image. Design based metrology systems are able to extract information of whole chip CD variation. According to the results, OPC abnormality was identified and design feedback items are also disclosed. The other approaches are accomplished on EDA companies, like model based OPC verifications. Model based verification will be done for full chip area by using well-calibrated model. The object of model based verification is the prediction of potential weak point on wafer and fast feed back to OPC and design before reticle fabrication. In order to achieve robust design and sufficient device margin, appropriate combination between design based metrology system and model based verification tools is very important. Therefore, we evaluated design based metrology system and matched model based verification system for optimum combination between two systems. In our study, huge amount of data from wafer results are classified and analyzed by statistical method and classified by OPC feedback and design feedback items. Additionally, novel DFM flow would be proposed by using combination of design based metrology and model based verification tools.

7 CFR 802.1 - Qualified laboratories.

Code of Federal Regulations, 2011 CFR

2011-01-01

... 7 Agriculture 7 2011-01-01 2011-01-01 false Qualified laboratories. 802.1 Section 802.1... REQUIREMENTS FOR GRAIN WEIGHING EQUIPMENT AND RELATED GRAIN HANDLING SYSTEMS § 802.1 Qualified laboratories. (a) Metrology laboratories. (1) Any State metrology laboratory currently approved by the NBS ongoing...

DABAM: an open-source database of X-ray mirrors metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sanchez del Rio, Manuel; Bianchi, Davide; Cocco, Daniele

2016-04-20

An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper,more » with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. Some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.« less

Optimal adaptive control for quantum metrology with time-dependent Hamiltonians.

PubMed

Pang, Shengshi; Jordan, Andrew N

2017-03-09

Quantum metrology has been studied for a wide range of systems with time-independent Hamiltonians. For systems with time-dependent Hamiltonians, however, due to the complexity of dynamics, little has been known about quantum metrology. Here we investigate quantum metrology with time-dependent Hamiltonians to bridge this gap. We obtain the optimal quantum Fisher information for parameters in time-dependent Hamiltonians, and show proper Hamiltonian control is generally necessary to optimize the Fisher information. We derive the optimal Hamiltonian control, which is generally adaptive, and the measurement scheme to attain the optimal Fisher information. In a minimal example of a qubit in a rotating magnetic field, we find a surprising result that the fundamental limit of T 2 time scaling of quantum Fisher information can be broken with time-dependent Hamiltonians, which reaches T 4 in estimating the rotation frequency of the field. We conclude by considering level crossings in the derivatives of the Hamiltonians, and point out additional control is necessary for that case.

DABAM: an open-source database of X-ray mirrors metrology

PubMed Central

Sanchez del Rio, Manuel; Bianchi, Davide; Cocco, Daniele; Glass, Mark; Idir, Mourad; Metz, Jim; Raimondi, Lorenzo; Rebuffi, Luca; Reininger, Ruben; Shi, Xianbo; Siewert, Frank; Spielmann-Jaeggi, Sibylle; Takacs, Peter; Tomasset, Muriel; Tonnessen, Tom; Vivo, Amparo; Yashchuk, Valeriy

2016-01-01

An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper, with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. Some optics simulations are presented and discussed to illustrate the real use of the profiles from the database. PMID:27140145

World wide matching of registration metrology tools of various generations

NASA Astrophysics Data System (ADS)

Laske, F.; Pudnos, A.; Mackey, L.; Tran, P.; Higuchi, M.; Enkrich, C.; Roeth, K.-D.; Schmidt, K.-H.; Adam, D.; Bender, J.

2008-10-01

Turn around time/cycle time is a key success criterion in the semiconductor photomask business. Therefore, global mask suppliers typically allocate work loads based on fab capability and utilization capacity. From a logistical point of view, the manufacturing location of a photomask should be transparent to the customer (mask user). Matching capability of production equipment and especially metrology tools is considered a key enabler to guarantee cross site manufacturing flexibility. Toppan, with manufacturing sites in eight countries worldwide, has an on-going program to match the registration metrology systems of all its production sites. This allows for manufacturing flexibility and risk mitigation.In cooperation with Vistec Semiconductor Systems, Toppan has recently completed a program to match the Vistec LMS IPRO systems at all production sites worldwide. Vistec has developed a new software feature which allows for significantly improved matching of LMS IPRO(x) registration metrology tools of various generations. We will report on the results of the global matching campaign of several of the leading Toppan sites.

DABAM: An open-source database of X-ray mirrors metrology

DOE PAGES

Sanchez del Rio, Manuel; Bianchi, Davide; Cocco, Daniele; ...

2016-05-01

An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper,more » with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. In conclusion, some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.« less

Importance of education and competence maintenance in metrology field (measurement science)

NASA Astrophysics Data System (ADS)

Dobiliene, J.; Meskuotiene, A.

2015-02-01

For certain tasks in metrology field trained employers might be necessary to fulfill specific requirements. It is important to pay attention that metrologists are responsible for fluent work of devices that belong to huge variety of vide spectrum of measurements. People who perform measurements (that are related to our safety, security or everyday life) with reliable measuring instruments must be sure for trueness of their results or conclusions. So with the purpose to reach the harmony between the ordinary man and his used means it is very important to ensure competence of specialists that are responsible for mentioned harmony implementation. Usually these specialists have a university degree and perform highly specified tasks in science, industry or laboratories. Their task is quite narrow. For example, type approval of measuring instrument or calibration and verification. Due to the fact that the number of such employers and their tasks is relatively small in the field of legal metrology, this paper focuses on the significance of training and qualification of legal metrology officers.

DABAM: an open-source database of X-ray mirrors metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sanchez del Rio, Manuel; Bianchi, Davide; Cocco, Daniele

An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper,more » with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. Some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.« less

DABAM: An open-source database of X-ray mirrors metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sanchez del Rio, Manuel; Bianchi, Davide; Cocco, Daniele

An open-source database containing metrology data for X-ray mirrors is presented. It makes available metrology data (mirror heights and slopes profiles) that can be used with simulation tools for calculating the effects of optical surface errors in the performances of an optical instrument, such as a synchrotron beamline. A typical case is the degradation of the intensity profile at the focal position in a beamline due to mirror surface errors. This database for metrology (DABAM) aims to provide to the users of simulation tools the data of real mirrors. The data included in the database are described in this paper,more » with details of how the mirror parameters are stored. An accompanying software is provided to allow simple access and processing of these data, calculate the most usual statistical parameters, and also include the option of creating input files for most used simulation codes. In conclusion, some optics simulations are presented and discussed to illustrate the real use of the profiles from the database.« less

Optimal adaptive control for quantum metrology with time-dependent Hamiltonians

PubMed Central

Pang, Shengshi; Jordan, Andrew N.

2017-01-01

Quantum metrology has been studied for a wide range of systems with time-independent Hamiltonians. For systems with time-dependent Hamiltonians, however, due to the complexity of dynamics, little has been known about quantum metrology. Here we investigate quantum metrology with time-dependent Hamiltonians to bridge this gap. We obtain the optimal quantum Fisher information for parameters in time-dependent Hamiltonians, and show proper Hamiltonian control is generally necessary to optimize the Fisher information. We derive the optimal Hamiltonian control, which is generally adaptive, and the measurement scheme to attain the optimal Fisher information. In a minimal example of a qubit in a rotating magnetic field, we find a surprising result that the fundamental limit of T2 time scaling of quantum Fisher information can be broken with time-dependent Hamiltonians, which reaches T4 in estimating the rotation frequency of the field. We conclude by considering level crossings in the derivatives of the Hamiltonians, and point out additional control is necessary for that case. PMID:28276428

Error Modeling of Multi-baseline Optical Truss. Part II; Application to SIM Metrology Truss Field Dependent Error

NASA Technical Reports Server (NTRS)

Zhang, Liwei Dennis; Milman, Mark; Korechoff, Robert

2004-01-01

The current design of the Space Interferometry Mission (SIM) employs a 19 laser-metrology-beam system (also called L19 external metrology truss) to monitor changes of distances between the fiducials of the flight system's multiple baselines. The function of the external metrology truss is to aid in the determination of the time-variations of the interferometer baseline. The largest contributor to truss error occurs in SIM wide-angle observations when the articulation of the siderostat mirrors (in order to gather starlight from different sky coordinates) brings to light systematic errors due to offsets at levels of instrument components (which include comer cube retro-reflectors, etc.). This error is labeled external metrology wide-angle field-dependent error. Physics-based model of field-dependent error at single metrology gauge level is developed and linearly propagated to errors in interferometer delay. In this manner delay error sensitivity to various error parameters or their combination can be studied using eigenvalue/eigenvector analysis. Also validation of physics-based field-dependent model on SIM testbed lends support to the present approach. As a first example, dihedral error model is developed for the comer cubes (CC) attached to the siderostat mirrors. Then the delay errors due to this effect can be characterized using the eigenvectors of composite CC dihedral error. The essence of the linear error model is contained in an error-mapping matrix. A corresponding Zernike component matrix approach is developed in parallel, first for convenience of describing the RMS of errors across the field-of-regard (FOR), and second for convenience of combining with additional models. Average and worst case residual errors are computed when various orders of field-dependent terms are removed from the delay error. Results of the residual errors are important in arriving at external metrology system component requirements. Double CCs with ideally co-incident vertices reside with the siderostat. The non-common vertex error (NCVE) is treated as a second example. Finally combination of models, and various other errors are discussed.

Remote laboratories for optical metrology: from the lab to the cloud

NASA Astrophysics Data System (ADS)

Osten, W.; Wilke, M.; Pedrini, G.

2012-10-01

The idea of remote and virtual metrology has been reported already in 2000 with a conceptual illustration by use of comparative digital holography, aimed at the comparison of two nominally identical but physically different objects, e.g., master and sample, in industrial inspection processes. However, the concept of remote and virtual metrology can be extended far beyond this. For example, it does not only allow for the transmission of static holograms over the Internet, but also provides an opportunity to communicate with and eventually control the physical set-up of a remote metrology system. Furthermore, the metrology system can be modeled in the environment of a 3D virtual reality using CAD or similar technology, providing a more intuitive interface to the physical setup within the virtual world. An engineer or scientist who would like to access the remote real world system can log on to the virtual system, moving and manipulating the setup through an avatar and take the desired measurements. The real metrology system responds to the interaction between the avatar and the 3D virtual representation, providing a more intuitive interface to the physical setup within the virtual world. The measurement data are stored and interpreted automatically for appropriate display within the virtual world, providing the necessary feedback to the experimenter. Such a system opens up many novel opportunities in industrial inspection such as the remote master-sample-comparison and the virtual assembling of parts that are fabricated at different places. Moreover, a multitude of new techniques can be envisaged. To them belong modern ways for documenting, efficient methods for metadata storage, the possibility for remote reviewing of experimental results, the adding of real experiments to publications by providing remote access to the metadata and to the experimental setup via Internet, the presentation of complex experiments in classrooms and lecture halls, the sharing of expensive and complex infrastructure within international collaborations, the implementation of new ways for the remote test of new devices, for their maintenance and service, and many more. The paper describes the idea of remote laboratories and illustrates the potential of the approach on selected examples with special attention to optical metrology.

Metrological assessment of the methods for measuring the contents of acids and ion metals responsible for the exchangeable acidity of soils

NASA Astrophysics Data System (ADS)

Vanchikova, E. V.; Shamrikova, E. V.; Bespyatykh, N. V.; Kyz"yurova, E. V.; Kondratenok, B. M.

2015-02-01

Metrological characteristics—precision, trueness, and accuracy—of the results of measurements of the exchangeable acidity and its components by the potentiometric titration method were studied on the basis of multiple analyses of the soil samples with the examination of statistical data for the outliers and their correspondence to the normal distribution. Measurement errors were estimated. The applied method was certified by the Metrological Center of the Uralian Branch of the Russian Academy of Sciences (certificate no. 88-17641-094-2013) and included in the Federal Information Fund on Assurance of Measurements (FR 1.31.2013.16382).

Mycotoxin metrology: Gravimetric production of zearalenone calibration solution

NASA Astrophysics Data System (ADS)

Rego, E. C. P.; Simon, M. E.; Li, Xiuqin; Li, Xiaomin; Daireaux, A.; Choteau, T.; Westwood, S.; Josephs, R. D.; Wielgosz, R. I.; Cunha, V. S.

2018-03-01

Food safety is a major concern for countries developing metrology and quality assurance systems, including the contamination of food and feed by mycotoxins. To improve the mycotoxin analysis and ensure the metrological traceability, CRM of calibration solution should be used. The production of certified mycotoxin solutions is a major challenge due to the limited amount of standard for conducting a proper purity study and due to the cost of standards. The CBKT project was started at BIPM and Inmetro produced gravimetrically one batch of zearelenone in acetronitrile (14.708 ± 0.016 μg/g, k=2) and conducted homogeneity, stability and value assignment studies.

Axial-Stereo 3-D Optical Metrology for Inner Profile of Pipes Using a Scanning Laser Endoscope

NASA Astrophysics Data System (ADS)

Gong, Yuanzheng; Johnston, Richard S.; Melville, C. David; Seibel, Eric J.

2015-07-01

As the rapid progress in the development of optoelectronic components and computational power, 3-D optical metrology becomes more and more popular in manufacturing and quality control due to its flexibility and high speed. However, most of the optical metrology methods are limited to external surfaces. This article proposed a new approach to measure tiny internal 3-D surfaces with a scanning fiber endoscope and axial-stereo vision algorithm. A dense, accurate point cloud of internally machined threads was generated to compare with its corresponding X-ray 3-D data as ground truth, and the quantification was analyzed by Iterative Closest Points algorithm.

Nano-metrology and terrain modelling - convergent practice in surface characterisation

USGS Publications Warehouse

Pike, R.J.

2000-01-01

The quantification of magnetic-tape and disk topography has a macro-scale counterpart in the Earth sciences - terrain modelling, the numerical representation of relief and pattern of the ground surface. The two practices arose independently and continue to function separately. This methodological paper introduces terrain modelling, discusses its similarities to and differences from industrial surface metrology, and raises the possibility of a unified discipline of quantitative surface characterisation. A brief discussion of an Earth-science problem, subdividing a heterogeneous terrain surface from a set of sample measurements, exemplifies a multivariate statistical procedure that may transfer to tribological applications of 3-D metrological height data.

Performance of the Primary Mirror Center-of-Curvature Optical Metrology System during Cryogenic Testing of the JWST Pathfinder Telescope

NASA Technical Reports Server (NTRS)

Hadaway, James B.; Wells, Conrad; Olczak, Gene; Waldman, Mark; Whitman, Tony; Cosentino, Joseph; Connolly, Mark; Chaney, David; Telfer, Randal

2016-01-01

The JWST primary mirror consists of 18 1.5 m hexagonal segments, each with 6-DoF and RoC adjustment. The telescope will be tested at its cryogenic operating temperature at Johnson Space Center. The testing will include center-of-curvature measurements of the PM, using the Center-of-Curvature Optical Assembly (COCOA) and the Absolute Distance Meter Assembly (ADMA). The performance of these metrology systems, including hardware, software, procedures, was assessed during two cryogenic tests at JSC, using the JWST Pathfinder telescope. This paper describes the test setup, the testing performed, and the resulting metrology system performance.

Sub-microradian Surface Slope Metrology with the ALS Developmental Long Trace Profiler

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yashchuk, Valeriy V; Barber, Samuel; Domning, Edward E.

2009-09-11

A new low budget slope measuring instrument, the Developmental Long Trace Profiler (DLTP), was recently brought to operation at the ALS Optical Metrology Laboratory. The design, instrumental control and data acquisition system, initial alignment and calibration procedures, as well as the developed experimental precautions and procedures are described in detail. The capability of the DLTP to achieve sub-microradian surface slope metrology is verified via cross-comparison measurements with other high performance slope measuring instruments when measuring the same high quality test optics. The directions of future work to develop a surface slope measuring profiler with nano-radian performance are also discussed.

Single-Grating Talbot Imaging for Wavefront Sensing and X-Ray Metrology

DOE Office of Scientific and Technical Information (OSTI.GOV)

Grizolli, Walan; Shi, Xianbo; Kolodziej, Tomasz

2017-01-01

Single-grating Talbot imaging relies on high-spatial-resolution detectors to perform accurate measurements of X-ray beam wavefronts. The wavefront can be retrieved with a single image, and a typical measurement and data analysis can be performed in few seconds. These qualities make it an ideal tool for synchrotron beamline diagnostics and in-situ metrology. The wavefront measurement can be used both to obtain a phase contrast image of an object and to characterize an X-ray beam. In this work, we explore the concept in two cases: at-wavelength metrology of 2D parabolic beryllium lenses and a wavefront sensor using a diamond crystal beam splitter.

Empirical Reference Distributions for Networks of Different Size

PubMed Central

Smith, Anna; Calder, Catherine A.; Browning, Christopher R.

2016-01-01

Network analysis has become an increasingly prevalent research tool across a vast range of scientific fields. Here, we focus on the particular issue of comparing network statistics, i.e. graph-level measures of network structural features, across multiple networks that differ in size. Although “normalized” versions of some network statistics exist, we demonstrate via simulation why direct comparison is often inappropriate. We consider normalizing network statistics relative to a simple fully parameterized reference distribution and demonstrate via simulation how this is an improvement over direct comparison, but still sometimes problematic. We propose a new adjustment method based on a reference distribution constructed as a mixture model of random graphs which reflect the dependence structure exhibited in the observed networks. We show that using simple Bernoulli models as mixture components in this reference distribution can provide adjusted network statistics that are relatively comparable across different network sizes but still describe interesting features of networks, and that this can be accomplished at relatively low computational expense. Finally, we apply this methodology to a collection of ecological networks derived from the Los Angeles Family and Neighborhood Survey activity location data. PMID:27721556

Self-Mixing Thin-Slice Solid-State Laser Metrology

PubMed Central

Otsuka, Kenju

2011-01-01

This paper reviews the dynamic effect of thin-slice solid-state lasers subjected to frequency-shifted optical feedback, which led to the discovery of the self-mixing modulation effect, and its applications to quantum-noise-limited versatile laser metrology systems with extreme optical sensitivity. PMID:22319406

Kite: status of the external metrology testbed for SIM

NASA Astrophysics Data System (ADS)

Dekens, Frank G.; Alvarez-Salazar, Oscar S.; Azizi, Alireza; Moser, Steven J.; Nemati, Bijan; Negron, John; Neville, Timothy; Ryan, Daniel

2004-10-01

Kite is a system level testbed for the External Metrology System of the Space Interferometry Mission (SIM). The External Metrology System is used to track the fiducials that are located at the centers of the interferometer's siderostats. The relative changes in their positions needs to be tracked to an accuracy of tens of picometers in order to correct for thermal deformations and attitude changes of the spacecraft. Because of the need for such high precision measurements, the Kite testbed was build to test both the metrology gauges and our ability to optically model the system at these levels. The Kite testbed is a redundant metrology truss, in which 6 lengths are measured, but only 5 are needed to define the system. The RMS error between the redundant measurements needs to be less than 140pm for the SIM Wide-Angle observing scenario and less than 8 pm for the Narrow-Angle observing scenario. With our current testbed layout, we have achieved an RMS of 85 pm in the Wide-Angle case, meeting the goal. For the Narrow-Angle case, we have reached 5.8 pm, but only for on-axis observations. We describe the testbed improvements that have been made since our initial results, and outline the future Kite changes that will add further effects that SIM faces in order to make the testbed more representative of SIM.

Coherence enhanced quantum metrology in a nonequilibrium optical molecule

NASA Astrophysics Data System (ADS)

Wang, Zhihai; Wu, Wei; Cui, Guodong; Wang, Jin

2018-03-01

We explore the quantum metrology in an optical molecular system coupled to two environments with different temperatures, using a quantum master equation beyond secular approximation. We discover that the steady-state coherence originating from and sustained by the nonequilibrium condition can enhance quantum metrology. We also study the quantitative measures of the nonequilibrium condition in terms of the curl flux, heat current and entropy production at the steady state. They are found to grow with temperature difference. However, an apparent paradox arises considering the contrary behaviors of the steady-state coherence and the nonequilibrium measures in relation to the inter-cavity coupling strength. This paradox is resolved by decomposing the heat current into a population part and a coherence part. Only the latter, the coherence part of the heat current, is tightly connected to the steady-state coherence and behaves similarly with respect to the inter-cavity coupling strength. Interestingly, the coherence part of the heat current flows from the low-temperature reservoir to the high-temperature reservoir, opposite to the direction of the population heat current. Our work offers a viable way to enhance quantum metrology for open quantum systems through steady-state coherence sustained by the nonequilibrium condition, which can be controlled and manipulated to maximize its utility. The potential applications go beyond quantum metrology and extend to areas such as device designing, quantum computation and quantum technology in general.

Form measurement of a 0.1 mm diameter wire with a chromatic confocal sensor, with associated uncertainty evaluation

NASA Astrophysics Data System (ADS)

Sanz, Claude; Giusca, Claudiu; Morantz, Paul; Marin, Antonio; Chérif, Ahmed; Schneider, Jürgen; Mainaud-Durand, Hélène; Shore, Paul; Steffens, Norbert

2018-07-01

The accurate characterisation of a copper–beryllium wire with a diameter of 0.1 mm is one of the steps to increase the precision of future accelerators’ pre-alignment. Novelties in measuring the wire properties were found in order to overcome the difficulties brought by its small size. This paper focuses on an implementation of a chromatic-confocal sensor leading to a sub-micrometric uncertainty on the form measurements. Hence, this text reveals a high-accuracy metrology technique applicable to objects with small diameters: it details the methodology, describes a validation by comparison with a reference and specifies the uncertainty budget of this technique.

A study to assess the long-term stability of the ionization chamber reference system in the LNMRI

NASA Astrophysics Data System (ADS)

Trindade Filho, O. L.; Conceição, D. A.; da Silva, C. J.; Delgado, J. U.; de Oliveira, A. E.; Iwahara, A.; Tauhata, L.

2018-03-01

Ionization chambers are used as secondary standard in order to maintain the calibration factors of radionuclides in the activity measurements in metrology laboratories. Used as radionuclide calibrator in nuclear medicine clinics to control dose in patients, its long-term performance is not evaluated systematically. A methodology for long-term evaluation for its stability is monitored and checked. Historical data produced monthly of 2012 until 2017, by an ionization chamber, electrometer and 226Ra, were analyzed via control chart, aiming to follow the long-term performance. Monitoring systematic errors were consistent within the limits of control, demonstrating the quality of measurements in compliance with ISO17025.

Exploring the Frequency Stability Limits of Whispering Gallery Mode Resonators for Metrological Applications

NASA Technical Reports Server (NTRS)

Chembo, Yanne K.; Baumgartel, Lukas; Grudinin, Ivan; Strekalov, Dmitry; Thompson, Robert; Yu, Nan

2012-01-01

Whispering gallery mode resonators are attracting increasing interest as promising frequency reference cavities. Unlike commonly used Fabry-Perot cavities, however, they are filled with a bulk medium whose properties have a significant impact on the stability of its resonance frequencies. In this context that has to be reduced to a minimum. On the other hand, a small monolithic resonator provides opportunity for better stability against vibration and acceleration. this feature is essential when the cavity operates in a non-laboratory environment. In this paper, we report a case study for a crystalline resonator, and discuss the a pathway towards the inhibition of vibration-and acceleration-induced frequency fluctuations.

Tributyltin--critical pollutant in whole water samples--development of traceable measurement methods for monitoring under the European Water Framework Directive (WFD) 2000/60/EC.

PubMed

Richter, Janine; Fettig, Ina; Philipp, Rosemarie; Jakubowski, Norbert

2015-07-01

Tributyltin is listed as one of the priority substances in the European Water Framework Directive (WFD). Despite its decreasing input in the environment, it is still present and has to be monitored. In the European Metrology Research Programme project ENV08, a sensitive and reliable analytical method according to the WFD was developed to quantify this environmental pollutant at a very low limit of quantification. With the development of such a primary reference method for tributyltin, the project helped to improve the quality and comparability of monitoring data. An overview of project aims and potential analytical tools is given.

Final report on SIM.T-S5: comparison of the calibration of 100 Ω platinum resistance thermometers

NASA Astrophysics Data System (ADS)

del Campo, D.; García, S.; Velasquez, A.; Medrano, J. A.; Solano, A.; Torres, H. E.

2015-01-01

An International Comparison on industrial Platinum Resistance Thermometers (PRTs) among the National Metrology Institutes (NMIs) of Spain, Panama, Honduras, El Salvador, Costa Rica and Nicaragua began in 2013 and was successfully completed in 2014. Two PRTs were circulated (hand carried) and compared in the range from -38.8 °C up to 250 °C. The Centro Español de Metrología (Spanish NMI), CEM, acted as the pilot laboratory providing the reference value of the comparison. The thermometers have shown an acceptable behavior throughout the comparison, therefore the results can be considered valid for comparing the measurement capabilities of the participant laboratories. The equivalence between the participant laboratories in the calibration of platinum resistance thermometers by comparison in the range from -38,8 °C up to 250 °C has been demonstrated in almost all cases. This report presents the results of this comparison and provides detailed information of the measurements performed by the participating laboratories. Main text. To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCT, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Report on key comparison COOMET.AUV.A-K5: pressure calibration of laboratory standard microphones in the frequency range 2 Hz to 10 kHz

NASA Astrophysics Data System (ADS)

Dobrowolska, D.; Kosterov, A.

2016-01-01

This is the final report for regional key comparison COOMET.AUV.A-K5 on the pressure calibration of laboratory standard microphones in the frequency range from 2 Hz to 10 kHz. Two laboratories—Central Office of Measures (GUM)—the national metrology institute for Poland and the State Enterprise Scientific-Research Institute for Metrology of Measurement and Control Systems (DP NDI Systema)— the designated institute for acoustics in Ukraine took part in this comparison with the GUM as a pilot. One travelling type LS1P microphone was circulated to the participants and results in the form of regular calibration certificates were collected. The results of the DP NDI Systema obtained in this comparison were linked to the CCAUV.A-K5 key comparison through the joint participation of the GUM. The degrees of equivalence were computed for DP NDI Systema with respect to the CCAUV.A-K5 key comparison reference value. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCAUV, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Bayesian statistics in radionuclide metrology: measurement of a decaying source

NASA Astrophysics Data System (ADS)

Bochud, François O.; Bailat, Claude J.; Laedermann, Jean-Pascal

2007-08-01

The most intuitive way of defining a probability is perhaps through the frequency at which it appears when a large number of trials are realized in identical conditions. The probability derived from the obtained histogram characterizes the so-called frequentist or conventional statistical approach. In this sense, probability is defined as a physical property of the observed system. By contrast, in Bayesian statistics, a probability is not a physical property or a directly observable quantity, but a degree of belief or an element of inference. The goal of this paper is to show how Bayesian statistics can be used in radionuclide metrology and what its advantages and disadvantages are compared with conventional statistics. This is performed through the example of an yttrium-90 source typically encountered in environmental surveillance measurement. Because of the very low activity of this kind of source and the small half-life of the radionuclide, this measurement takes several days, during which the source decays significantly. Several methods are proposed to compute simultaneously the number of unstable nuclei at a given reference time, the decay constant and the background. Asymptotically, all approaches give the same result. However, Bayesian statistics produces coherent estimates and confidence intervals in a much smaller number of measurements. Apart from the conceptual understanding of statistics, the main difficulty that could deter radionuclide metrologists from using Bayesian statistics is the complexity of the computation.

Tip Characterization Method using Multi-feature Characterizer for CD-AFM

PubMed Central

Orji, Ndubuisi G.; Itoh, Hiroshi; Wang, Chumei; Dixson, Ronald G.; Walecki, Peter S.; Schmidt, Sebastian W.; Irmer, Bernd

2016-01-01

In atomic force microscopy (AFM) metrology, the tip is a key source of uncertainty. Images taken with an AFM show a change in feature width and shape that depends on tip geometry. This geometric dilation is more pronounced when measuring features with high aspect ratios, and makes it difficult to obtain absolute dimensions. In order to accurately measure nanoscale features using an AFM, the tip dimensions should be known with a high degree of precision. We evaluate a new AFM tip characterizer, and apply it to critical dimension AFM (CD-AFM) tips used for high aspect ratio features. The characterizer is made up of comb-shaped lines and spaces, and includes a series of gratings that could be used as an integrated nanoscale length reference. We also demonstrate a simulation method that could be used to specify what range of tip sizes and shapes the characterizer can measure. Our experiments show that for non re-entrant features, the results obtained with this characterizer are consistent to 1 nm with the results obtained by using widely accepted but slower methods that are common practice in CD-AFM metrology. A validation of the integrated length standard using displacement interferometry indicates a uniformity of better than 0.75%, suggesting that the sample could be used as highly accurate and SI traceable lateral scale for the whole evaluation process. PMID:26720439

The influence of micro-vibration on space-borne Fourier transform spectrometers

NASA Astrophysics Data System (ADS)

Bai, Shaojun; Hou, Lizhou; Ke, Junyu

2014-11-01

The space-borne Fourier Transform Spectrometers (FTS) are widely used for atmospheric studies and planetary explorations. An adapted version of the classical Michelson interferometer have succeeded in several space missions, which utilized a rotating arm carrying a pair of cube corner retro-reflectors to produce a variable optical path difference (OPD), and a metrology laser source to generate the trigger signals. One characteristic of this kind of FTS is that it is highly sensitive to micro-vibration disturbances. However, a variety of mechanical disturbances are present as the satellite is in orbit, such as flying wheels, pointing mechanisms and cryocoolers. Therefore, this paper investigates the influence of micro-vibration on the space-borne FTS. Firstly, the interferogram of metrology laser under harmonic disturbances is analyzed. The results show that the zero crossings of interferogram shift periodically, and it gives rise to ghost lines in the retrieved spectra. The amplitudes of ghost lines increase rapidly with the increasing of micro-vibration levels. As to the system that employs the constant OPD sampling strategy, the effect of zero-crossing shifting is reduced significantly. Nevertheless, the time delays between the reference signal and the main signal acquisition are inevitable because of the electronic circuit. Thus, the effect of time delays on the interferogram and eventually on the spectra is simulated. The analysis suggests that the amplitudes of ghost line in spectra increase with the increasing of time delay intervals.

Photogrammetric Metrology for the James Webb Space Telescope Integrated Science Instrument Module

NASA Technical Reports Server (NTRS)

Nowak, Maria; Crane, Allen; Davila, Pam; Eichhorn, William; Gill, James; Herrera, Acey; Hill, Michael; Hylan, Jason; Jetten, Mark; Marsh, James;

Airborne Comparisons of an Ultra-Stable Quartz Oscillator with a H-Maser as Another Possible Validation of General Relativity

DTIC Science & Technology

1999-12-01

POSSIBLE VALIDATION OF GENERAL RELATIVITY Andrei A. Grishaev Institute of Metrology for Time and Space (IMVP), GP VNIIFTRI 141570 Mendeleevo...Metrology for Time and Space (IMVP),GP VNIIFTRI ,141570 Mendeleevo, Russia, 8. PERFORMING ORGANIZATION REPORT NUMBER 9. SPONSORING/MONITORING AGENCY

Review of EuCARD project on accelerator infrastructure in Europe

NASA Astrophysics Data System (ADS)

Romaniuk, Ryszard S.

2013-01-01

The aim of big infrastructural and research programs (like pan-European Framework Programs) and individual projects realized inside these programs in Europe is to structure the European Research Area - ERA in this way as to be competitive with the leaders of the world. One of this projects in EuCARD (European Coordination of Accelerator Research and Development) with the aim to structure and modernize accelerator, (including accelerators for big free electron laser machines) research infrastructure. This article presents the periodic development of EuCARD which took place between the annual meeting, April 2012 in Warsaw and SC meeting in Uppsala, December 2012. The background of all these efforts are achievements of the LHC machine and associated detectors in the race for new physics. The LHC machine works in the regime of p-p, Pb-p, Pb-Pb (protons and lead ions). Recently, a discovery by the LHC of Higgs like boson, has started vivid debates on the further potential of this machine and the future. The periodic EuCARD conference, workshop and meetings concern building of the research infrastructure, including in this advanced photonic and electronic systems for servicing large high energy physics experiments. There are debated a few basic groups of such systems like: measurement - control networks of large geometrical extent, multichannel systems for large amounts of metrological data acquisition, precision photonic networks of reference time, frequency and phase distribution. The aim of the discussion is not only summarize the current status but make plans and prepare practically to building new infrastructures. Accelerator science and technology is one of a key enablers of the developments in the particle physic, photon physics and also applications in medicine and industry. Accelerator technology is intensely developed in all developed nations and regions of the world. The EuCARD project contains a lot of subjects related directly and indirectly to photon physics and photonics, as well as optoelectronics, electronics and integration of these with large research infrastructure.

NASA Metrology and Calibration, 1980

NASA Technical Reports Server (NTRS)

1981-01-01

The proceedings of the fourth annual NASA Metrology and Calibration Workshop are presented. This workshop covered (1) review and assessment of NASA metrology and calibration activities by NASA Headquarters, (2) results of audits by the Office of Inspector General, (3) review of a proposed NASA Equipment Management System, (4) current and planned field center activities, (5) National Bureau of Standards (NBS) calibration services for NASA, (6) review of NBS's Precision Measurement and Test Equipment Project activities, (7) NASA instrument loan pool operations at two centers, (8) mobile cart calibration systems at two centers, (9) calibration intervals and decals, (10) NASA Calibration Capabilities Catalog, and (11) development of plans and objectives for FY 1981. Several papers in this proceedings are slide presentations only.

Structural considerations for fabrication and mounting of the AXAF HRMA optics

NASA Technical Reports Server (NTRS)

Cohen, Lester M.; Cernoch, Larry; Mathews, Gary; Stallcup, Michael

1990-01-01

A methodology is described which minimizes optics distortion in the fabrication, metrology, and launch configuration phases. The significance of finite element modeling and breadboard testing is described with respect to performance analyses of support structures and material effects in NASA's AXAF X-ray optics. The paper outlines the requirements for AXAF performance, optical fabrication, metrology, and glass support fixtures, as well as the specifications for mirror sensitivity and the high-resolution mirror assembly. Analytical modeling of the tools is shown to coincide with grinding and polishing experiments, and is useful for designing large-area polishing and grinding tools. Metrological subcomponents that have undergone initial testing show evidence of meeting force requirements.

A new way of measuring wiggling pattern in SADP for 3D NAND technology

NASA Astrophysics Data System (ADS)

Mi, Jian; Chen, Ziqi; Tu, Li Ming; Mao, Xiaoming; Liu, Gong Cai; Kawada, Hiroki

2018-03-01

A new metrology method of quantitatively measuring wiggling patterns in a Self-Aligned Double Patterning (SADP) process for 2D NAND technology has been developed with a CD-SEM metrology program on images from a Review-SEM system. The metrology program provided accurate modeling of various wiggling patterns. The Review-SEM system provided a-few-micrometer-wide Field of View (FOV), which exceeds precision-guaranteed FOV of a conventional CD-SEM. The result has been effectively verified by visual inspection on vertically compressed images compared with Wiggling Index from this new method. A best-known method (BKM) system has been developed with connected HW and SW to automatically measure wiggling patterns.

Laser and Optical Fiber Metrology in Romania

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sporea, Dan; Sporea, Adelina

2008-04-15

The Romanian government established in the last five years a National Program for the improvement of country's infrastructure of metrology. The set goal was to develop and accredit testing and calibration laboratories, as well as certification bodies, according to the ISO 17025:2005 norm. Our Institute benefited from this policy, and developed a laboratory for laser and optical fibers metrology in order to provide testing and calibration services for the certification of laser-based industrial, medical and communication products. The paper will present the laboratory accredited facilities and some of the results obtained in the evaluation of irradiation effects of optical andmore » optoelectronic parts, tests run under the EU's Fusion Program.« less

Freeform metrology using subaperture stitching interferometry

NASA Astrophysics Data System (ADS)

Supranowitz, Chris; Lormeau, Jean-Pierre; Maloney, Chris; Murphy, Paul; Dumas, Paul

2016-11-01

As applications for freeform optics continue to grow, the need for high-precision metrology is becoming more of a necessity. Currently, coordinate measuring machines (CMM) that implement touch probes or optical probes can measure the widest ranges of shapes of freeform optics, but these measurement solutions often lack sufficient lateral resolution and accuracy. Subaperture stitching interferometry (SSI™) extends traditional Fizeau interferometry to provide accurate, high-resolution measurements of flats, spheres, and aspheres, and development is currently on-going to enable measurements of freeform surfaces. We will present recent freeform metrology results, including repeatability and cross-test data. We will also present MRF® polishing results where the stitched data was used as the input "hitmap" to the deterministic polishing process.

Evaluating diffraction based overlay metrology for double patterning technologies

NASA Astrophysics Data System (ADS)

Saravanan, Chandra Saru; Liu, Yongdong; Dasari, Prasad; Kritsun, Oleg; Volkman, Catherine; Acheta, Alden; La Fontaine, Bruno

2008-03-01

Demanding sub-45 nm node lithographic methodologies such as double patterning (DPT) pose significant challenges for overlay metrology. In this paper, we investigate scatterometry methods as an alternative approach to meet these stringent new metrology requirements. We used a spectroscopic diffraction-based overlay (DBO) measurement technique in which registration errors are extracted from specially designed diffraction targets for double patterning. The results of overlay measurements are compared to traditional bar-in-bar targets. A comparison between DBO measurements and CD-SEM measurements is done to show the correlation between the two approaches. We discuss the total measurement uncertainty (TMU) requirements for sub-45 nm nodes and compare TMU from the different overlay approaches.

MSE-impact of PPP-RTK ZTD estimation strategies

NASA Astrophysics Data System (ADS)

Wang, K.; Khodabandeh, A.; Teunissen, P. J. G.

2018-06-01

In PPP-RTK network processing, the wet component of the zenith tropospheric delay (ZTD) cannot be precisely modelled and thus remains unknown in the observation equations. For small networks, the tropospheric mapping functions of different stations to a given satellite are almost equal to each other, thereby causing a near rank-deficiency between the ZTDs and satellite clocks. The stated near rank-deficiency can be solved by estimating the wet ZTD components relatively to that of the reference receiver, while the wet ZTD component of the reference receiver is constrained to zero. However, by increasing network scale and humidity around the reference receiver, enlarged mismodelled effects could bias the network and the user solutions. To consider both the influences of the noise and the biases, the mean-squared errors (MSEs) of different network and user parameters are studied analytically employing both the ZTD estimation strategies. We conclude that for a certain set of parameters, the difference in their MSE structures using both strategies is only driven by the square of the reference wet ZTD component and the formal variance of its solution. Depending on the network scale and the humidity condition around the reference receiver, the ZTD estimation strategy that delivers more accurate solutions might be different. Simulations are performed to illustrate the conclusions made by analytical studies. We find that estimating the ZTDs relatively in large networks and humid regions (for the reference receiver) could significantly degrade the network ambiguity success rates. Using ambiguity-fixed network-derived PPP-RTK corrections, for networks with an inter-station distance within 100 km, the choices of the ZTD estimation strategy is not crucial for single-epoch ambiguity-fixed user positioning. Using ambiguity-float network corrections, for networks with inter-station distances of 100, 300 and 500 km in humid regions (for the reference receiver), the root-mean-squared errors (RMSEs) of the estimated user coordinates using relative ZTD estimation could be higher than those under the absolute case with differences up to millimetres, centimetres and decimetres, respectively.

Proficiency Tests for Environmental Radioactivity Measurement Organized by an Accredited Laboratory

NASA Astrophysics Data System (ADS)

Aubert, Cédric; Osmond, Mélanie

2008-08-01

For 40 years, STEME (Environmental Sample Processing and Metrology Department) organized international proficiency testing (PT) exercises formerly for WHO (World Health Organization) and EC (European Community) and currently for ASN (French Nuclear Safety Authority). Five PT exercises are organized each year for the measurement of radionuclides (alpha, beta and gamma) in different matrixes (water, soil, biological and air samples) at environmental levels. ASN can deliver a French ministerial agreement to participate on environmental radioactivity measurements French network for laboratories asking it [1]. Since 2006, November, STEME is the first French entity obtaining a COFRAC (French Committee of Accreditation) accreditation as "Interlaboratory Comparisons" for the organization of proficiency tests for environmental radioactivity measurement according to standard International Standard Organization (ISO) 17025 and guide ISO 43-1. STEME has in charge to find, as far as possible, real sample or to create, by radionuclide adding, an adapted sample. STEME realizes the sampling, the samples preparation and the dispatching. STEME is also accredited according to Standard 17025 for radioactivity measurements in environmental samples and determines homogeneity, stability and reference values. After the reception of participating laboratories results, STEME executes statistical treatments in order to verify the normal distribution, to eliminate outliers and to evaluate laboratories performance. Laboratories participate with several objectives, to obtain French agreement, to prove the quality of their analytical performance in regards to standard 17025 or to validate new methods or latest developments. For 2 years, in addition to usual PT exercises, new PT about alpha or beta measurement in air filters, radioactive iodine in carbon cartridges or measurement of environmental dosimeters are organized. These PT exercises help laboratories to improve radioactive measurements and to rectify old mistakes. The PT exercises organized by STEME are becoming essential for French and some European laboratories working in radioactive measurements. The STEME organization, in respect of accreditation references, is presented.

Proficiency Tests for Environmental Radioactivity Measurement Organized by an Accredited Laboratory

DOE Office of Scientific and Technical Information (OSTI.GOV)

Aubert, Cedric; Osmond, Melanie

2008-08-14

For 40 years, STEME (Environmental Sample Processing and Metrology Department) organized international proficiency testing (PT) exercises formerly for WHO (World Health Organization) and EC (European Community) and currently for ASN (French Nuclear Safety Authority). Five PT exercises are organized each year for the measurement of radionuclides (alpha, beta and gamma) in different matrixes (water, soil, biological and air samples) at environmental levels. ASN can deliver a French ministerial agreement to participate on environmental radioactivity measurements French network for laboratories asking it. Since 2006, November, STEME is the first French entity obtaining a COFRAC (French Committee of Accreditation) accreditation as 'Interlaboratorymore » Comparisons' for the organization of proficiency tests for environmental radioactivity measurement according to standard International Standard Organization (ISO) 17025 and guide ISO 43-1. STEME has in charge to find, as far as possible, real sample or to create, by radionuclide adding, an adapted sample. STEME realizes the sampling, the samples preparation and the dispatching. STEME is also accredited according to Standard 17025 for radioactivity measurements in environmental samples and determines homogeneity, stability and reference values. After the reception of participating laboratories results, STEME executes statistical treatments in order to verify the normal distribution, to eliminate outliers and to evaluate laboratories performance.Laboratories participate with several objectives, to obtain French agreement, to prove the quality of their analytical performance in regards to standard 17025 or to validate new methods or latest developments. For 2 years, in addition to usual PT exercises, new PT about alpha or beta measurement in air filters, radioactive iodine in carbon cartridges or measurement of environmental dosimeters are organized. These PT exercises help laboratories to improve radioactive measurements and to rectify old mistakes. The PT exercises organized by STEME are becoming essential for French and some European laboratories working in radioactive measurements.The STEME organization, in respect of accreditation references, is presented.« less

Nuclear Technology. Course 27: Metrology. Module 27-5, Tolerancing.

ERIC Educational Resources Information Center

Selleck, Ben; Espy, John

This fifth in a series of eight modules for a course titled Metrology describes the application of the American National Standard (ANSI Y14.5-1973) for dimensioning and tolerancing and gives guidance on interpreting form and location controls consistent with the national standard. The module follows a typical format that includes the following…

Cultural capital as a measurand

NASA Astrophysics Data System (ADS)

Taymanov, R.; Sapozhnikova, K.

2016-11-01

The necessity for developing metrology due to extension of its application sphere is noted. The efficiency of the metrological approach to measurement of multidimensional quantities in the field of humanities is shown using the development of cultural capital interpreted by L. Harrison. The cultural capital is defined as a measure of the society structure complexity and adaptive capacity.

Development of the metrology and imaging of cellulose nanocrystals

Treesearch

Michael T. Postek; Andras Vladar; John Dagata; Natalia Farkas; Bin Ming; Ryan Wagner; Arvind Raman; Robert J. Moon; Ronald Sabo; Theodore H. Wegner; James Beecher

2011-01-01

The development of metrology for nanoparticles is a significant challenge. Cellulose nanocrystals (CNCs) are one group of nanoparticles that have high potential economic value but present substantial challenges to the development of the measurement science. Even the largest trees owe their strength to this newly appreciated class of nanomaterials. Cellulose is the...

The Remarkable Metrological History of Radiocarbon Dating [II].

PubMed

Currie, Lloyd A

2004-01-01

This article traces the metrological history of radiocarbon, from the initial breakthrough devised by Libby, to minor (evolutionary) and major (revolutionary) advances that have brought (14)C measurement from a crude, bulk [8 g carbon] dating tool, to a refined probe for dating tiny amounts of precious artifacts, and for "molecular dating" at the 10 µg to 100 µg level. The metrological advances led to opportunities and surprises, such as the non-monotonic dendrochronological calibration curve and the "bomb effect," that gave rise to new multidisciplinary areas of application, ranging from archaeology and anthropology to cosmic ray physics to oceanography to apportionment of anthropogenic pollutants to the reconstruction of environmental history. Beyond the specific topic of natural (14)C, it is hoped that this account may serve as a metaphor for young scientists, illustrating that just when a scientific discipline may appear to be approaching maturity, unanticipated metrological advances in their own chosen fields, and unanticipated anthropogenic or natural chemical events in the environment, can spawn new areas of research having exciting theoretical and practical implications.

A laser scanning system for metrology and viewing in ITER

DOE Office of Scientific and Technical Information (OSTI.GOV)

Spampinato, P.T.; Barry, R.E.; Menon, M.M.

1996-05-01

The construction and operation of a next-generation fusion reactor will require metrology to achieve and verify precise alignment of plasma-facing components and inspection in the reactor vessel. The system must be compatible with the vessel environment of high gamma radiation (10{sup 4} Gy/h), ultra-high-vacuum (10{sup {minus}8} torr), and elevated temperature (200 C). The high radiation requires that the system be remotely deployed. A coherent frequency modulated laser radar-based system will be integrated with a remotely operated deployment mechanism to meet these requirements. The metrology/viewing system consists of a compact laser transceiver optics module which is linked through fiber optics tomore » the laser source and imaging units that are located outside of a biological shield. The deployment mechanism will be a mast-like positioning system. Radiation-damage tests will be conducted on critical sensor components at Oak Ridge National Laboratory to determine threshold damage levels and effects on data transmission. This paper identifies the requirements for International Thermonuclear Experimental Reactor metrology and viewing and describes a remotely operated precision ranging and surface mapping system.« less

The Remarkable Metrological History of Radiocarbon Dating [II

PubMed Central

Currie, Lloyd A.

2004-01-01

This article traces the metrological history of radiocarbon, from the initial breakthrough devised by Libby, to minor (evolutionary) and major (revolutionary) advances that have brought 14C measurement from a crude, bulk [8 g carbon] dating tool, to a refined probe for dating tiny amounts of precious artifacts, and for “molecular dating” at the 10 µg to 100 µg level. The metrological advances led to opportunities and surprises, such as the non-monotonic dendrochronological calibration curve and the “bomb effect,” that gave rise to new multidisciplinary areas of application, ranging from archaeology and anthropology to cosmic ray physics to oceanography to apportionment of anthropogenic pollutants to the reconstruction of environmental history. Beyond the specific topic of natural 14C, it is hoped that this account may serve as a metaphor for young scientists, illustrating that just when a scientific discipline may appear to be approaching maturity, unanticipated metrological advances in their own chosen fields, and unanticipated anthropogenic or natural chemical events in the environment, can spawn new areas of research having exciting theoretical and practical implications. PMID:27366605

Understanding Imaging and Metrology with the Helium Ion Microscope

NASA Astrophysics Data System (ADS)

Postek, Michael T.; Vladár, András E.; Ming, Bin

2009-09-01

One barrier to innovation confronting all phases of nanotechnology is the lack of accurate metrology for the characterization of nanomaterials. Ultra-high resolution microscopy is a key technology needed to achieve this goal. But, current microscope technology is being pushed to its limits. The scanning and transmission electron microscopes have incrementally improved in performance and other scanned probe technologies such as atomic force microscopy, scanning tunneling microscopy and focused ion beam microscopes have all been applied to nanotechnology with various levels of success. A relatively new tool for nanotechnology is the scanning helium ion microscope (HIM). The HIM is a new complementary imaging and metrology technology for nanotechnology which may be able to push the current resolution barrier lower. But, successful imaging and metrology with this instrument entails new ion beam/specimen interaction physics which must be fully understood. As a new methodology, HIM is beginning to show promise and the abundance of potentially advantageous applications for nanotechnology have yet to be fully exploited. This presentation will discuss some of the progress made at NIST in understanding the science behind this new technique.

Quantitative optical metrology with CMOS cameras

NASA Astrophysics Data System (ADS)

Furlong, Cosme; Kolenovic, Ervin; Ferguson, Curtis F.

2004-08-01

Recent advances in laser technology, optical sensing, and computer processing of data, have lead to the development of advanced quantitative optical metrology techniques for high accuracy measurements of absolute shapes and deformations of objects. These techniques provide noninvasive, remote, and full field of view information about the objects of interest. The information obtained relates to changes in shape and/or size of the objects, characterizes anomalies, and provides tools to enhance fabrication processes. Factors that influence selection and applicability of an optical technique include the required sensitivity, accuracy, and precision that are necessary for a particular application. In this paper, sensitivity, accuracy, and precision characteristics in quantitative optical metrology techniques, and specifically in optoelectronic holography (OEH) based on CMOS cameras, are discussed. Sensitivity, accuracy, and precision are investigated with the aid of National Institute of Standards and Technology (NIST) traceable gauges, demonstrating the applicability of CMOS cameras in quantitative optical metrology techniques. It is shown that the advanced nature of CMOS technology can be applied to challenging engineering applications, including the study of rapidly evolving phenomena occurring in MEMS and micromechatronics.

Linear Optical Quantum Metrology with Single Photons: Exploiting Spontaneously Generated Entanglement to Beat the Shot-Noise Limit

NASA Astrophysics Data System (ADS)

Motes, Keith R.; Olson, Jonathan P.; Rabeaux, Evan J.; Dowling, Jonathan P.; Olson, S. Jay; Rohde, Peter P.

2015-05-01

Quantum number-path entanglement is a resource for supersensitive quantum metrology and in particular provides for sub-shot-noise or even Heisenberg-limited sensitivity. However, such number-path entanglement has been thought to be resource intensive to create in the first place—typically requiring either very strong nonlinearities, or nondeterministic preparation schemes with feedforward, which are difficult to implement. Very recently, arising from the study of quantum random walks with multiphoton walkers, as well as the study of the computational complexity of passive linear optical interferometers fed with single-photon inputs, it has been shown that such passive linear optical devices generate a superexponentially large amount of number-path entanglement. A logical question to ask is whether this entanglement may be exploited for quantum metrology. We answer that question here in the affirmative by showing that a simple, passive, linear-optical interferometer—fed with only uncorrelated, single-photon inputs, coupled with simple, single-mode, disjoint photodetection—is capable of significantly beating the shot-noise limit. Our result implies a pathway forward to practical quantum metrology with readily available technology.

In-line height profiling metrology sensor for zero defect production control

NASA Astrophysics Data System (ADS)

Snel, Rob; Winters, Jasper; Liebig, Thomas; Jonker, Wouter

2017-06-01

Contemporary production systems of mechanical precision parts show challenges as increased complexity, tolerances shrinking to sub-microns and yield losses that must be mastered to the extreme. More advanced automation and process control is required to accomplish this task. Often a solution based on feedforward/feedback control is chosen requiring innovative and more advanced in line metrology. This article concentrates first on the context of in line metrology for process control and then on the development of a specific in line height profiling sensor. The novel sensor technology is based on full field time domain white light interferometry which is well know from the quality lab. The novel metrology system is to be mounted close to the production equipment, as required to minimize time delay in the control loop, and is thereby fully exposed to vibrations. This sensor is innovated to perform in line with an orders of magnitude faster throughput than laboratory instruments; it's robust to withstand the rigors of workshops and has a height resolution that is in the nanometer range.

Application of advanced diffraction based optical metrology overlay capabilities for high-volume manufacturing

NASA Astrophysics Data System (ADS)

Chen, Kai-Hsiung; Huang, Guo-Tsai; Hsieh, Hung-Chih; Ni, Wei-Feng; Chuang, S. M.; Chuang, T. K.; Ke, Chih-Ming; Huang, Jacky; Rao, Shiuan-An; Cumurcu Gysen, Aysegul; d'Alfonso, Maxime; Yueh, Jenny; Izikson, Pavel; Soco, Aileen; Wu, Jon; Nooitgedagt, Tjitte; Ottens, Jeroen; Kim, Yong Ho; Ebert, Martin

2017-03-01

On-product overlay requirements are becoming more challenging with every next technology node due to the continued decrease of the device dimensions and process tolerances. Therefore, current and future technology nodes require demanding metrology capabilities such as target designs that are robust towards process variations and high overlay measurement density (e.g. for higher order process corrections) to enable advanced process control solutions. The impact of advanced control solutions based on YieldStar overlay data is being presented in this paper. Multi patterning techniques are applied for critical layers and leading to additional overlay measurement demands. The use of 1D process steps results in the need of overlay measurements relative to more than one layer. Dealing with the increased number of overlay measurements while keeping the high measurement density and metrology accuracy at the same time presents a challenge for high volume manufacturing (HVM). These challenges are addressed by the capability to measure multi-layer targets with the recently introduced YieldStar metrology tool, YS350. On-product overlay results of such multi-layers and standard targets are presented including measurement stability performance.

Flexible resources for quantum metrology

NASA Astrophysics Data System (ADS)

Friis, Nicolai; Orsucci, Davide; Skotiniotis, Michalis; Sekatski, Pavel; Dunjko, Vedran; Briegel, Hans J.; Dür, Wolfgang

2017-06-01

Quantum metrology offers a quadratic advantage over classical approaches to parameter estimation problems by utilising entanglement and nonclassicality. However, the hurdle of actually implementing the necessary quantum probe states and measurements, which vary drastically for different metrological scenarios, is usually not taken into account. We show that for a wide range of tasks in metrology, 2D cluster states (a particular family of states useful for measurement-based quantum computation) can serve as flexible resources that allow one to efficiently prepare any required state for sensing, and perform appropriate (entangled) measurements using only single qubit operations. Crucially, the overhead in the number of qubits is less than quadratic, thus preserving the quantum scaling advantage. This is ensured by using a compression to a logarithmically sized space that contains all relevant information for sensing. We specifically demonstrate how our method can be used to obtain optimal scaling for phase and frequency estimation in local estimation problems, as well as for the Bayesian equivalents with Gaussian priors of varying widths. Furthermore, we show that in the paradigmatic case of local phase estimation 1D cluster states are sufficient for optimal state preparation and measurement.

CONFERENCE NOTE: European Optical Society, Topical Meeting Optical Metrology and Nanotechnology, Engelberg, Switzerland, 27 30 March 1994

NASA Astrophysics Data System (ADS)

1993-01-01

This meeting, organized by the Paul Scherrer Institute's Department of Applied Solid State Physics, will be held from 27 30 March 1994 at the Hotel Regina-Titlis, Engelberg, Switzerland. The aim is to bring together scientists from two important fields of current research and increasing industrial relevance. Optical metrology is a traditional discipline of applied optics which reached the nanometre scale a long time ago. Nanotechnology is setting new limits and represents a major challenge to metrology, as well as offering new opportunities to optics. The meeting is intended to help define a common future for optical metrology and nanotechnology. Topics to be covered include: nanometre position control and measuring techniques ultrahigh precision interferometry scanning probe microscopy (AFM, SNOM, etc.) surface modification by scanning probe methods precision surface fabrication and characterization nanolithography micro-optics, diffractive optics components, including systems and applications subwavelength optical structures synthetic optical materials structures and technologies for X-ray optics. For further information please contact: Jens Gobrecht (Secretary), Paul Scherrer Institute, CH-5232 Villigen-PSI, Switzerland.Tel. (41)56992529; Fax (41) 5698 2635.

Linear optical quantum metrology with single photons: exploiting spontaneously generated entanglement to beat the shot-noise limit.

PubMed

Motes, Keith R; Olson, Jonathan P; Rabeaux, Evan J; Dowling, Jonathan P; Olson, S Jay; Rohde, Peter P

2015-05-01

Quantum number-path entanglement is a resource for supersensitive quantum metrology and in particular provides for sub-shot-noise or even Heisenberg-limited sensitivity. However, such number-path entanglement has been thought to be resource intensive to create in the first place--typically requiring either very strong nonlinearities, or nondeterministic preparation schemes with feedforward, which are difficult to implement. Very recently, arising from the study of quantum random walks with multiphoton walkers, as well as the study of the computational complexity of passive linear optical interferometers fed with single-photon inputs, it has been shown that such passive linear optical devices generate a superexponentially large amount of number-path entanglement. A logical question to ask is whether this entanglement may be exploited for quantum metrology. We answer that question here in the affirmative by showing that a simple, passive, linear-optical interferometer--fed with only uncorrelated, single-photon inputs, coupled with simple, single-mode, disjoint photodetection--is capable of significantly beating the shot-noise limit. Our result implies a pathway forward to practical quantum metrology with readily available technology.

Error modelling of quantum Hall array resistance standards

NASA Astrophysics Data System (ADS)

Marzano, Martina; Oe, Takehiko; Ortolano, Massimo; Callegaro, Luca; Kaneko, Nobu-Hisa

2018-04-01

Quantum Hall array resistance standards (QHARSs) are integrated circuits composed of interconnected quantum Hall effect elements that allow the realization of virtually arbitrary resistance values. In recent years, techniques were presented to efficiently design QHARS networks. An open problem is that of the evaluation of the accuracy of a QHARS, which is affected by contact and wire resistances. In this work, we present a general and systematic procedure for the error modelling of QHARSs, which is based on modern circuit analysis techniques and Monte Carlo evaluation of the uncertainty. As a practical example, this method of analysis is applied to the characterization of a 1 MΩ QHARS developed by the National Metrology Institute of Japan. Software tools are provided to apply the procedure to other arrays.

Multipulse addressing of a Raman quantum memory: configurable beam splitting and efficient readout.

PubMed

Reim, K F; Nunn, J; Jin, X-M; Michelberger, P S; Champion, T F M; England, D G; Lee, K C; Kolthammer, W S; Langford, N K; Walmsley, I A

2012-06-29

Quantum memories are vital to the scalability of photonic quantum information processing (PQIP), since the storage of photons enables repeat-until-success strategies. On the other hand, the key element of all PQIP architectures is the beam splitter, which allows us to coherently couple optical modes. Here, we show how to combine these crucial functionalities by addressing a Raman quantum memory with multiple control pulses. The result is a coherent optical storage device with an extremely large time bandwidth product, that functions as an array of dynamically configurable beam splitters, and that can be read out with arbitrarily high efficiency. Networks of such devices would allow fully scalable PQIP, with applications in quantum computation, long distance quantum communications and quantum metrology.

Results of x-ray mirror round-robin metrology measurements at the APS, ESRF, and SPring-8 optical metrology laboratories.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Assoufid, L.; Rommeveaux, A.; Ohashi, H.

2005-01-01

This paper presents the first series of round-robin metrology measurements of x-ray mirrors organized at the Advanced Photon Source (APS) in the USA, the European Synchrotron Radiation Facility in France, and the Super Photon Ring (SPring-8) (in a collaboration with Osaka University, ) in Japan. This work is part of the three institutions' three-way agreement to promote a direct exchange of research information and experience amongst their specialists. The purpose of the metrology round robin is to compare the performance and limitations of the instrumentation used at the optical metrology laboratories of these facilities and to set the basis formore » establishing guidelines and procedures to accurately perform the measurements. The optics used in the measurements were selected to reflect typical, as well as state of the art, in mirror fabrication. The first series of the round robin measurements focuses on flat and cylindrical mirrors with varying sizes and quality. Three mirrors (two flats and one cylinder) were successively measured using long trace profilers. Although the three facilities' LTPs are of different design, the measurements were found to be in excellent agreement. The maximum discrepancy of the rms slope error values is 0.1 {micro}rad, that of the rms shape error was 3 nm, and they all relate to the measurement of the cylindrical mirror. The next round-robin measurements will deal with elliptical and spherical optics.« less

The MeteoMet2 project—highlights and results

NASA Astrophysics Data System (ADS)

Merlone, A.; Sanna, F.; Beges, G.; Bell, S.; Beltramino, G.; Bojkovski, J.; Brunet, M.; del Campo, D.; Castrillo, A.; Chiodo, N.; Colli, M.; Coppa, G.; Cuccaro, R.; Dobre, M.; Drnovsek, J.; Ebert, V.; Fernicola, V.; Garcia-Benadí, A.; Garcia-Izquierdo, C.; Gardiner, T.; Georgin, E.; Gonzalez, A.; Groselj, D.; Heinonen, M.; Hernandez, S.; Högström, R.; Hudoklin, D.; Kalemci, M.; Kowal, A.; Lanza, L.; Miao, P.; Musacchio, C.; Nielsen, J.; Nogueras-Cervera, M.; Oguz Aytekin, S.; Pavlasek, P.; de Podesta, M.; Rasmussen, M. K.; del-Río-Fernández, J.; Rosso, L.; Sairanen, H.; Salminen, J.; Sestan, D.; Šindelářová, L.; Smorgon, D.; Sparasci, F.; Strnad, R.; Underwood, R.; Uytun, A.; Voldan, M.

2018-02-01

Launched in 2011 within the European Metrology Research Programme (EMRP) of EURAMET, the joint research project ‘MeteoMet’—Metrology for Meteorology—is the largest EMRP consortium; national metrology institutes, universities, meteorological and climate agencies, research institutes, collaborators and manufacturers are working together, developing new metrological techniques, as well as improving existing ones, for use in meteorological observations and climate records. The project focuses on humidity in the upper and surface atmosphere, air temperature, surface and deep-sea temperatures, soil moisture, salinity, permafrost temperature, precipitation, and the snow albedo effect on air temperature. All tasks are performed using a rigorous metrological approach and include the design and study of new sensors, new calibration facilities, the investigation of sensor characteristics, improved techniques for measurements of essential climate variables with uncertainty evaluation, traceability, laboratory proficiency and the inclusion of field influencing parameters, long-lasting measurements, and campaigns in remote and extreme areas. The vision for MeteoMet is to take a step further towards establishing full data comparability, coherency, consistency, and long-term continuity, through a comprehensive evaluation of the measurement uncertainties for the quantities involved in the global climate observing systems and the derived observations. The improvement in quality of essential climate variables records, through the inclusion of measurement uncertainty budgets, will also highlight possible strategies for the reduction of the uncertainty. This contribution presents selected highlights of the MeteoMet project and reviews the main ongoing activities, tasks and deliverables, with a view to its possible future evolution and extended impact.

Enabling optical metrology on small 5×5μm2 in-cell targets to support flexible sampling and higher order overlay and CD control for advanced logic devices nodes

NASA Astrophysics Data System (ADS)

Salerno, Antonio; de la Fuente, Isabel; Hsu, Zack; Tai, Alan; Chang, Hammer; McNamara, Elliott; Cramer, Hugo; Li, Daoping

2018-03-01

In next generation Logic devices, overlay control requirements shrink to sub 2.5nm level on-product overlay. Historically on-product overlay has been defined by the overlay capability of after-develop in-scribe targets. However, due to design and dimension, the after development metrology targets are not completely representative for the final overlay of the device. In addition, they are confined to the scribe-lane area, which limits the sampling possibilities. To address these two issues, metrology on structures matching the device structure and which can be sampled with high density across the device is required. Conventional after-etch CDSEM techniques on logic devices present difficulties in discerning the layers of interest, potential destructive charging effects and finally, they are limited by the long measurement times[1] [2] [3] . All together, limit the sampling densities and making CDSEM less attractive for control applications. Optical metrology can overcome most of these limitations. Such measurement, however, does require repetitive structures. This requirement is not fulfilled by logic devices, as the features vary in pitch and CD over the exposure field. The solution is to use small targets, with a maximum pad size of 5x5um2 , which can easily be placed in the logic cell area. These targets share the process and architecture of the device features of interest, but with a modified design that replicates as close as possible the device layout, allowing for in-device metrology for both CD and Overlay. This solution enables measuring closer to the actual product feature location and, not being limited to scribe-lanes, it opens the possibility of higher-density sampling schemes across the field. In summary, these targets become the facilitator of in-device metrology (IDM), that is, enabling the measurements both in-device Overlay and the CD parameters of interest and can deliver accurate, high-throughput, dense and after-etch measurements for Logic. Overlay improvements derived from a high-densely sampled Overlay map measured with 5x5 um2 In Device Metrology (IDM) targets were investigated on a customer Logic application. In this work we present both the main design aspects of the 5x5 um2 IDM targets, as well as the results on the improved Overlay performance.

75 FR 25294 - Notice Pursuant to the National Cooperative Research and Production Act of 1993-High Definition...

Federal Register 2010, 2011, 2012, 2013, 2014

2010-05-07

... DEPARTMENT OF JUSTICE Antitrust Division Notice Pursuant to the National Cooperative Research and Production Act of 1993--High Definition Metrology and Process-2 Micron Manufacturing Under ATP Award No... Metrology and Process-2 Micron Manufacturing under ATP Award No. 70NANB7H7041 has filed written...

Signal processing for order 10 pm accuracy displacement metrology in real-world scientific applications

NASA Technical Reports Server (NTRS)

Halverson, Peter G.; Loya, Frank M.

2004-01-01

This paper describes heterodyne displacement metrology gauge signal processing methods that achieve satisfactory robustness against low signal strength and spurious signals, and good long-term stability. We have a proven displacement-measuring approach that is useful not only to space-optical projects at JPL, but also to the wider field of distance measurements.

Fundamental Principles of Coherent-Feedback Quantum Control

DTIC Science & Technology

2014-12-08

in metrology (acceleration sensing, vibrometry, gravity wave detection) and in quantum information processing (continuous-variables quantum ...AFRL-OSR-VA-TR-2015-0009 FUNDAMENTAL PRINCIPLES OF COHERENT-FEEDBACK QUANTUM CONTROL Hideo Mabuchi LELAND STANFORD JUNIOR UNIV CA Final Report 12/08...foundations and potential applications of coherent-feedback quantum control. We have focused on potential applications in quantum -enhanced metrology and

77 FR 25406 - Consortium on “Concrete Rheology: Enabling Metrology (CREME)”: Membership Fee Update

Federal Register 2010, 2011, 2012, 2013, 2014

2012-04-30

... Technology (NIST) published a notice of a public meeting, which was held on November 8, 2011, to explore the feasibility of establishing a NIST/Industry Consortium on Concrete Rheology: Enabling Metrology (CREME)''. The... INFORMATION CONTACT: Chiara Ferraris or Nicos Martys via email at [email protected]nist.gov ; [email protected]nist...

Parasitic light scattered by complex optical coatings: modelization and metrology

NASA Astrophysics Data System (ADS)

Zerrad, Myriam; Lequime, Michel; Liukaityte, Simona; Amra, Claude

2017-12-01

Optical components realized for space applications have to be mastered in term of parasitic light. This paper present the last improvements performed at the Institute Fresnel to predict and measure scattering losses of optical components with a special care to complex optical coatings. Agreement between numerical models and metrology is now excellent. Some examples will be presented.

Optimized Biasing of Pump Laser Diodes in a Highly Reliable Metrology Source for Long-Duration Space Missions

NASA Technical Reports Server (NTRS)

Poberezhskiy, Ilya Y; Chang, Daniel H.; Erlig, Herman

2011-01-01

Optical metrology system reliability during a prolonged space mission is often limited by the reliability of pump laser diodes. We developed a metrology laser pump module architecture that meets NASA SIM Lite instrument optical power and reliability requirements by combining the outputs of multiple single-mode pump diodes in a low-loss, high port count fiber coupler. We describe Monte-Carlo simulations used to calculate the reliability of the laser pump module and introduce a combined laser farm aging parameter that serves as a load-sharing optimization metric. Employing these tools, we select pump module architecture, operating conditions, biasing approach and perform parameter sensitivity studies to investigate the robustness of the obtained solution.

Development and integration of high straightness flexure guiding mechanisms dedicated to the METAS watt balance Mark II

NASA Astrophysics Data System (ADS)

Cosandier, F.; Eichenberger, A.; Baumann, H.; Jeckelmann, B.; Bonny, M.; Chatagny, V.; Clavel, R.

2014-04-01

There is a firm will in the metrology community to redefine the kilogram in the International System of units by linking it to a fundamental physical constant. The watt balance is a promising way to link the mass unit to the Planck constant h. At the Federal Institute of Metrology METAS a second watt balance experiment is under development. A decisive part of the METAS Mark II watt balance is the mechanical linear guiding system. The present paper discusses the development and the metrological characteristics of two guiding systems that were conceived by the Laboratoire de Systèmes Robotiques of EPFL and built using flexure mechanical elements. Integration in the new setup is also described.

Metrology: Calibration and measurement processes guidelines

NASA Technical Reports Server (NTRS)

Castrup, Howard T.; Eicke, Woodward G.; Hayes, Jerry L.; Mark, Alexander; Martin, Robert E.; Taylor, James L.

1994-01-01

The guide is intended as a resource to aid engineers and systems contracts in the design, implementation, and operation of metrology, calibration, and measurement systems, and to assist NASA personnel in the uniform evaluation of such systems supplied or operated by contractors. Methodologies and techniques acceptable in fulfilling metrology quality requirements for NASA programs are outlined. The measurement process is covered from a high level through more detailed discussions of key elements within the process, Emphasis is given to the flowdown of project requirements to measurement system requirements, then through the activities that will provide measurements with defined quality. In addition, innovations and techniques for error analysis, development of statistical measurement process control, optimization of calibration recall systems, and evaluation of measurement uncertainty are presented.

Metrology applied to ultrasound characterization of trabecular bones using the AIB parameter

NASA Astrophysics Data System (ADS)

Braz, D. S.; Silva, C. E.; Alvarenga, A. V.; Junior, D. S.; Costa-Félix, R. P. B.

2016-07-01

Apparent Integrated Backscattering (AIB) presents correlation between Apparent Backscatter Transfer Function and the transducer bandwidth. Replicas of trabecular bones (cubes of 20 mm side length) created by 3D printing technique were characterized using AIB with a 2.25 MHz center frequency transducer. A mechanical scanning system was used to acquire multiple backscatter signals. An uncertainty model in measurement was proposed based on the Guide to the Expression of Uncertainty in Measurement. Initial AIB results are not metrologically reliable, presenting high measurement uncertainties (sample: 5_0.2032/AIB: -15.1 dB ± 13.9 dB). It is noteworthy that the uncertainty model proposed contributes as unprecedented way for metrological assessment of trabecular bone characterization using AIB.

An Embedded Wireless Sensor Network with Wireless Power Transmission Capability for the Structural Health Monitoring of Reinforced Concrete Structures.

PubMed

Gallucci, Luca; Menna, Costantino; Angrisani, Leopoldo; Asprone, Domenico; Moriello, Rosario Schiano Lo; Bonavolontà, Francesco; Fabbrocino, Francesco

2017-11-07

Maintenance strategies based on structural health monitoring can provide effective support in the optimization of scheduled repair of existing structures, thus enabling their lifetime to be extended. With specific regard to reinforced concrete (RC) structures, the state of the art seems to still be lacking an efficient and cost-effective technique capable of monitoring material properties continuously over the lifetime of a structure. Current solutions can typically only measure the required mechanical variables in an indirect, but economic, manner, or directly, but expensively. Moreover, most of the proposed solutions can only be implemented by means of manual activation, making the monitoring very inefficient and then poorly supported. This paper proposes a structural health monitoring system based on a wireless sensor network (WSN) that enables the automatic monitoring of a complete structure. The network includes wireless distributed sensors embedded in the structure itself, and follows the monitoring-based maintenance (MBM) approach, with its ABCDE paradigm, namely: accuracy, benefit, compactness, durability, and easiness of operations. The system is structured in a node level and has a network architecture that enables all the node data to converge in a central unit. Human control is completely unnecessary until the periodic evaluation of the collected data. Several tests are conducted in order to characterize the system from a metrological point of view and assess its performance and effectiveness in real RC conditions.

Report on NIM-NMC bilateral comparison: SPRT calibration comparison from -190°C to 420°C

NASA Astrophysics Data System (ADS)

Sun, Jianping; Ye, Shaochun; Wang, Li; Zhang, Jintao; Kho, Haoyuan

2016-01-01

A bilateral comparison of local realization of the International temperature scale of 1990 (ITS-90) between National Institute of Metrology (NIM) and National Metrology Centre (NMC) was carried out over the temperature range from -190°C to 420°C. It involved six fixed points including the argon triple point, the mercury triple point, the triple point of water, the melting point of gallium, the freezing point of tin and the freezing point of zinc. In 2009, NMC asked NIM to participate in a bilateral comparison to link the NMC results to the Consultative Committee for Thermometry Key comparison 3 (CCT-K3) and facilitate the NMC's Calibration and measurement capabilities (CMCs) submission. This comparison was agreed by NIM and Asia Pacific Metrology Programme (APMP) in 2009, and registered in the Key Comparison Database (KCDB) in 2010 as CCT-K3.2. NMC supplied two 25 Ω fused silica sheath standard platinum resistance thermometers (SPRTs) as traveling standards. One of them was used at the Ga, Sn and Zn fixed points, while the other one was used at the Ar and Hg fixed point. NMC measured them before and after NIM measurement. During the comparison, a criterion for the SPRT was set as the stability at the triple point of water to be less than 0.3 mK. The results for both laboratories are summarized. A proposal for linking the NMC's comparison results to CCT-K3 is presented. The difference between NMC and NIM and the difference between NMC and the CCT-K3 Average Reference Value (ARV) using NIM as a link are reported with expanded uncertainties at each measured fixed point. Main text To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database kcdb.bipm.org/. The final report has been peer-reviewed and approved for publication by the CCT, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA).

Calibration procedure for a laser triangulation scanner with uncertainty evaluation

NASA Astrophysics Data System (ADS)

Genta, Gianfranco; Minetola, Paolo; Barbato, Giulio

2016-11-01

Most of low cost 3D scanning devices that are nowadays available on the market are sold without a user calibration procedure to correct measurement errors related to changes in environmental conditions. In addition, there is no specific international standard defining a procedure to check the performance of a 3D scanner along time. This paper aims at detailing a thorough methodology to calibrate a 3D scanner and assess its measurement uncertainty. The proposed procedure is based on the use of a reference ball plate and applied to a triangulation laser scanner. Experimental results show that the metrological performance of the instrument can be greatly improved by the application of the calibration procedure that corrects systematic errors and reduces the device's measurement uncertainty.

Metrology Standards for Quantitative Imaging Biomarkers

PubMed Central

Obuchowski, Nancy A.; Kessler, Larry G.; Raunig, David L.; Gatsonis, Constantine; Huang, Erich P.; Kondratovich, Marina; McShane, Lisa M.; Reeves, Anthony P.; Barboriak, Daniel P.; Guimaraes, Alexander R.; Wahl, Richard L.

2015-01-01

Although investigators in the imaging community have been active in developing and evaluating quantitative imaging biomarkers (QIBs), the development and implementation of QIBs have been hampered by the inconsistent or incorrect use of terminology or methods for technical performance and statistical concepts. Technical performance is an assessment of how a test performs in reference objects or subjects under controlled conditions. In this article, some of the relevant statistical concepts are reviewed, methods that can be used for evaluating and comparing QIBs are described, and some of the technical performance issues related to imaging biomarkers are discussed. More consistent and correct use of terminology and study design principles will improve clinical research, advance regulatory science, and foster better care for patients who undergo imaging studies. © RSNA, 2015 PMID:26267831

Rapid and accurate assessment of the activity measurements in Brazilian hospitals and clinics.

PubMed

de Oliveira, A E; Iwahara, A; da Cruz, P A L; da Silva, C J; de Araújo, E B; Mengatti, J; da Silva, R L; Trindade, O L

2018-04-01

Traceability in Nuclear Medicine Service (NMS) measurements was checked by the Institute of Radioprotection and Dosimetry (IRD) through the Institute of Energy and Nuclear Research (IPEN). In 2016, IRD ran an intercomparison program and invited Brazilian NMS authorized to administer 131 I to patients. Sources of 131 I were distributed to 33 NMSs. Three other sources from the same solution were sent to IRD, after measurement at IPEN. These sources were calibrated in the IRD reference system. A correction factor of 1.013 was obtained. Ninety percent of the NMS comparisons results are within ±10% of the National Laboratory of Metrology of Ionizing Radiation (LNMRI) value, the Brazilian legal requirement. Copyright © 2017 Elsevier Ltd. All rights reserved.

Long working distance incoherent interference microscope

DOEpatents

Sinclair, Michael B [Albuquerque, NM; De Boer, Maarten P [Albuquerque, NM

2006-04-25

A full-field imaging, long working distance, incoherent interference microscope suitable for three-dimensional imaging and metrology of MEMS devices and test structures on a standard microelectronics probe station. A long working distance greater than 10 mm allows standard probes or probe cards to be used. This enables nanometer-scale 3-dimensional height profiles of MEMS test structures to be acquired across an entire wafer while being actively probed, and, optionally, through a transparent window. An optically identical pair of sample and reference arm objectives is not required, which reduces the overall system cost, and also the cost and time required to change sample magnifications. Using a LED source, high magnification (e.g., 50.times.) can be obtained having excellent image quality, straight fringes, and high fringe contrast.

Datum maintenance of the main Egyptian geodetic control networks by utilizing Precise Point Positioning "PPP" technique

NASA Astrophysics Data System (ADS)

Rabah, Mostafa; Elmewafey, Mahmoud; Farahan, Magda H.

2016-06-01

A geodetic control network is the wire-frame or the skeleton on which continuous and consistent mapping, Geographic Information Systems (GIS), and surveys are based. Traditionally, geodetic control points are established as permanent physical monuments placed in the ground and precisely marked, located, and documented. With the development of satellite surveying methods and their availability and high degree of accuracy, a geodetic control network could be established by using GNSS and referred to an international terrestrial reference frame used as a three-dimensional geocentric reference system for a country. Based on this concept, in 1992, the Egypt Survey Authority (ESA) established two networks, namely High Accuracy Reference Network (HARN) and the National Agricultural Cadastral Network (NACN). To transfer the International Terrestrial Reference Frame to the HARN, the HARN was connected with four IGS stations. The processing results were 1:10,000,000 (Order A) for HARN and 1:1,000,000 (Order B) for NACN relative network accuracy standard between stations defined in ITRF1994 Epoch1996. Since 1996, ESA did not perform any updating or maintaining works for these networks. To see how non-performing maintenance degrading the values of the HARN and NACN, the available HARN and NACN stations in the Nile Delta were observed. The Processing of the tested part was done by CSRS-PPP Service based on utilizing Precise Point Positioning "PPP" and Trimble Business Center "TBC". The study shows the feasibility of Precise Point Positioning in updating the absolute positioning of the HARN network and its role in updating the reference frame (ITRF). The study also confirmed the necessity of the absent role of datum maintenance of Egypt networks.

Building a Unified Information Network.

ERIC Educational Resources Information Center

Avram, Henriette D.

1988-01-01

Discusses cooperative efforts between research organizations and libraries to create a national information network. Topics discussed include the Linked System Project (LSP); technical processing versus reference and research functions; Open Systems Interconnection (OSI) Reference Model; the National Science Foundation Network (NSFNET); and…

Old boys' network in general practitioners' referral behavior?

PubMed

Hackl, Franz; Hummer, Michael; Pruckner, Gerald J

2015-09-01

We analyzed the impact of social networks on general practitioners' (GPs) referral behavior based on administrative panel data from 2,684,273 referrals to specialists made between 1998 and 2007. For the definition of social networks, we used information on the doctors' place and time of study and their hospital work history. We found that GPs referred more patients to specialists within their personal networks and that patients referred within a social network had fewer follow-up consultations and less inpatient days thereafter. The effects on patient outcomes (e.g. waiting periods, days in hospital) of referrals within personal networks and affinity-based networks differed. Specifically, whereas empirical evidence showed a concentration on high-quality specialists for referrals within the personal network, suggesting that referrals within personal networks overcome information asymmetry with respect to specialists' abilities, the empirical evidence for affinity-based networks was different and less clear. Same-gender networks tended to refer patients to low-quality specialists. Copyright © 2015 Elsevier B.V. All rights reserved.

Instrumentation, metrology, and standards: key elements for the future of nanomanufacturing

NASA Astrophysics Data System (ADS)

Postek, Michael T.; Lyons, Kevin

2007-09-01

Nanomanufacturing is the essential bridge between the discoveries of nanoscience and real world nanotech products and is the vehicle by which the Nation and the World will realize the promise of major technological innovation across a spectrum of products that will affect virtually every industrial sector. For nanotech products to achieve the broad impacts envisioned, they must be manufactured in market-appropriate quantities in a reliable, repeatable, economical and commercially viable manner. In addition, they must be manufactured so that environmental and human health concerns are met, worker safety issues are appropriately assessed and handled, and liability issues are addressed. Critical to this realization of robust nanomanufacturing is the development of the necessary instrumentation, metrology, and standards. Integration of the instruments, their interoperability, and appropriate information management are also critical elements that must be considered for viable nanomanufacturing. Advanced instrumentation, metrology and standards will allow the physical dimensions, properties, functionality, and purity of the materials, processes, tools, systems, products, and emissions that will constitute nanomanufacturing to be measured and characterized. This will in turn enable production to be scaleable, controllable, predictable, and repeatable to meet market needs. If a nano-product cannot be measured it cannot be manufactured; additionally if that product cannot be made safely it should not be manufactured. This presentation introduces the Instrumentation, Metrology, and Standards for Nanomanufacturing Conference at the 2007 SPIE Optics and Photonics. This conference will become the leading forum for the exchange of foundational information and discussion of instrumentation, metrology and standards which are key elements for the success of nanomanufacturing.

Efficiency improvements of offline metrology job creation

NASA Astrophysics Data System (ADS)

Zuniga, Victor J.; Carlson, Alan; Podlesny, John C.; Knutrud, Paul C.

1999-06-01

Progress of the first lot of a new design through the production line is watched very closely. All performance metrics, cycle-time, in-line measurement results and final electrical performance are critical. Rapid movement of this lot through the line has serious time-to-market implications. Having this material waiting at a metrology operation for an engineer to create a measurement job plan wastes valuable turnaround time. Further, efficient use of a metrology system is compromised by the time required to create and maintain these measurement job plans. Thus, having a method to develop metrology job plans prior to the actual running of the material through the manufacture area can significantly improve both cycle time and overall equipment efficiency. Motorola and Schlumberger have worked together to develop and test such a system. The Remote Job Generator (RJG) created job plans for new device sin a manufacturing process from an NT host or workstation, offline. This increases available system tim effort making production measurements, decreases turnaround time on job plan creation and editing, and improves consistency across job plans. Most importantly this allows job plans for new devices to be available before the first wafers of the device arrive at the tool for measurement. The software also includes a database manager which allows updates of existing job plans to incorporate measurement changes required by process changes or measurement optimization. This paper will review the result of productivity enhancements through the increased metrology utilization and decreased cycle time associated with the use of RJG. Finally, improvements in process control through better control of Job Plans across different devices and layers will be discussed.

Stochastic analysis of 1D and 2D surface topography of x-ray mirrors

NASA Astrophysics Data System (ADS)

Tyurina, Anastasia Y.; Tyurin, Yury N.; Yashchuk, Valeriy V.

2017-08-01

The design and evaluation of the expected performance of new optical systems requires sophisticated and reliable information about the surface topography for planned optical elements before they are fabricated. The problem is especially complex in the case of x-ray optics, particularly for the X-ray Surveyor under development and other missions. Modern x-ray source facilities are reliant upon the availability of optics with unprecedented quality (surface slope accuracy < 0.1μrad). The high angular resolution and throughput of future x-ray space observatories requires hundreds of square meters of high quality optics. The uniqueness of the optics and limited number of proficient vendors makes the fabrication extremely time consuming and expensive, mostly due to the limitations in accuracy and measurement rate of metrology used in fabrication. We discuss improvements in metrology efficiency via comprehensive statistical analysis of a compact volume of metrology data. The data is considered stochastic and a new statistical model called Invertible Time Invariant Linear Filter (InTILF) is developed now for 2D surface profiles to provide compact description of the 2D data additionally to 1D data treated so far. The model captures faint patterns in the data and serves as a quality metric and feedback to polishing processes, avoiding high resolution metrology measurements over the entire optical surface. The modeling, implemented in our Beatmark software, allows simulating metrology data for optics made by the same vendor and technology. The forecast data is vital for reliable specification for optical fabrication, to be exactly adequate for the required system performance.

Development of at-wavelength metrology for x-ray optics at the ALS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yashchuk, Valeriy V.; Goldberg, Kenneth A.; Yuan, Sheng

2010-07-09

The comprehensive realization of the exciting advantages of new third- and forth-generation synchrotron radiation light sources requires concomitant development of reflecting and diffractive x-ray optics capable of micro- and nano-focusing, brightness preservation, and super high resolution. The fabrication, tuning, and alignment of the optics are impossible without adequate metrology instrumentation, methods, and techniques. While the accuracy of ex situ optical metrology at the Advanced Light Source (ALS) has reached a state-of-the-art level, wavefront control on beamlines is often limited by environmental and systematic alignment factors, and inadequate in situ feedback. At ALS beamline 5.3.1, we are developing broadly applicable, high-accuracy,more » in situ, at-wavelength wavefront measurement techniques to surpass 100-nrad slope measurement accuracy for Kirkpatrick-Baez (KB) mirrors. The at-wavelength methodology we are developing relies on a series of tests with increasing accuracy and sensitivity. Geometric Hartmann tests, performed with a scanning illuminated sub-aperture determine the wavefront slope across the full mirror aperture. Shearing interferometry techniques use coherent illumination and provide higher sensitivity wavefront measurements. Combining these techniques with high precision optical metrology and experimental methods will enable us to provide in situ setting and alignment of bendable x-ray optics to realize diffraction-limited, sub 50 nm focusing at beamlines. We describe here details of the metrology beamline endstation, the x-ray beam diagnostic system, and original experimental techniques that have already allowed us to precisely set a bendable KB mirror to achieve a focused spot size of 150 nm.« less

An image-processing software package: UU and Fig for optical metrology applications

NASA Astrophysics Data System (ADS)

Chen, Lujie

2013-06-01

Modern optical metrology applications are largely supported by computational methods, such as phase shifting [1], Fourier Transform [2], digital image correlation [3], camera calibration [4], etc, in which image processing is a critical and indispensable component. While it is not too difficult to obtain a wide variety of image-processing programs from the internet; few are catered for the relatively special area of optical metrology. This paper introduces an image-processing software package: UU (data processing) and Fig (data rendering) that incorporates many useful functions to process optical metrological data. The cross-platform programs UU and Fig are developed based on wxWidgets. At the time of writing, it has been tested on Windows, Linux and Mac OS. The userinterface is designed to offer precise control of the underline processing procedures in a scientific manner. The data input/output mechanism is designed to accommodate diverse file formats and to facilitate the interaction with other independent programs. In terms of robustness, although the software was initially developed for personal use, it is comparably stable and accurate to most of the commercial software of similar nature. In addition to functions for optical metrology, the software package has a rich collection of useful tools in the following areas: real-time image streaming from USB and GigE cameras, computational geometry, computer vision, fitting of data, 3D image processing, vector image processing, precision device control (rotary stage, PZT stage, etc), point cloud to surface reconstruction, volume rendering, batch processing, etc. The software package is currently used in a number of universities for teaching and research.

Diffraction based overlay re-assessed

NASA Astrophysics Data System (ADS)

Leray, Philippe; Laidler, David; D'havé, Koen; Cheng, Shaunee

2011-03-01

In recent years, numerous authors have reported the advantages of Diffraction Based Overlay (DBO) over Image Based Overlay (IBO), mainly by comparison of metrology figures of merit such as TIS and TMU. Some have even gone as far as to say that DBO is the only viable overlay metrology technique for advanced technology nodes; 22nm and beyond. Typically the only reported drawback of DBO is the size of the required targets. This severely limits its effective use, when all critical layers of a product, including double patterned layers need to be measured, and in-die overlay measurements are required. In this paper we ask whether target size is the only limitation to the adoption of DBO for overlay characterization and control, or are there other metrics, which need to be considered. For example, overlay accuracy with respect to scanner baseline or on-product process overlay control? In this work, we critically re-assess the strengths and weaknesses of DBO for the applications of scanner baseline and on-product process layer overlay control. A comprehensive comparison is made to IBO. For on product process layer control we compare the performance on critical process layers; Gate, Contact and Metal. In particularly we focus on the response of the scanner to the corrections determined by each metrology technique for each process layer, as a measure of the accuracy. Our results show that to characterize an overlay metrology technique that is suitable for use in advanced technology nodes requires much more than just evaluating the conventional metrology metrics of TIS and TMU.

BOOK REVIEW: Evaluating the Measurement Uncertainty: Fundamentals and practical guidance

NASA Astrophysics Data System (ADS)

Lira, Ignacio

2003-08-01

Evaluating the Measurement Uncertainty is a book written for anyone who makes and reports measurements. It attempts to fill the gaps in the ISO Guide to the Expression of Uncertainty in Measurement, or the GUM, and does a pretty thorough job. The GUM was written with the intent of being applicable by all metrologists, from the shop floor to the National Metrology Institute laboratory; however, the GUM has often been criticized for its lack of user-friendliness because it is primarily filled with statements, but with little explanation. Evaluating the Measurement Uncertainty gives lots of explanations. It is well written and makes use of many good figures and numerical examples. Also important, this book is written by a metrologist from a National Metrology Institute, and therefore up-to-date ISO rules, style conventions and definitions are correctly used and supported throughout. The author sticks very closely to the GUM in topical theme and with frequent reference, so readers who have not read GUM cover-to-cover may feel as if they are missing something. The first chapter consists of a reprinted lecture by T J Quinn, Director of the Bureau International des Poids et Mesures (BIPM), on the role of metrology in today's world. It is an interesting and informative essay that clearly outlines the importance of metrology in our modern society, and why accurate measurement capability, and by definition uncertainty evaluation, should be so important. Particularly interesting is the section on the need for accuracy rather than simply reproducibility. Evaluating the Measurement Uncertainty then begins at the beginning, with basic concepts and definitions. The third chapter carefully introduces the concept of standard uncertainty and includes many derivations and discussion of probability density functions. The author also touches on Monte Carlo methods, calibration correction quantities, acceptance intervals or guardbanding, and many other interesting cases. The book goes on to treat evaluation of expanded uncertainty, joint treatment of several measurands, least-squares adjustment, curve fitting and more. Chapter 6 is devoted to Bayesian inference. Perhaps one can say that Evaluating the Measurement Uncertainty caters to a wider reader-base than the GUM; however, a mathematical or statistical background is still advantageous. Also, this is not a book with a library of worked overall uncertainty evaluations for various measurements; the feel of the book is rather theoretical. The novice will still have some work to do—but this is a good place to start. I think this book is a fitting companion to the GUM because the text complements the GUM, from fundamental principles to more sophisticated measurement situations, and moreover includes intelligent discussion regarding intent and interpretation. Evaluating the Measurement Uncertainty is detailed, and I think most metrologists will really enjoy the detail and care put into this book. Jennifer Decker

The Reference Ability Neural Network Study: Life-time stability of reference-ability neural networks derived from task maps of young adults.

PubMed

Habeck, C; Gazes, Y; Razlighi, Q; Steffener, J; Brickman, A; Barulli, D; Salthouse, T; Stern, Y

2016-01-15

Analyses of large test batteries administered to individuals ranging from young to old have consistently yielded a set of latent variables representing reference abilities (RAs) that capture the majority of the variance in age-related cognitive change: Episodic Memory, Fluid Reasoning, Perceptual Processing Speed, and Vocabulary. In a previous paper (Stern et al., 2014), we introduced the Reference Ability Neural Network Study, which administers 12 cognitive neuroimaging tasks (3 for each RA) to healthy adults age 20-80 in order to derive unique neural networks underlying these 4 RAs and investigate how these networks may be affected by aging. We used a multivariate approach, linear indicator regression, to derive a unique covariance pattern or Reference Ability Neural Network (RANN) for each of the 4 RAs. The RANNs were derived from the neural task data of 64 younger adults of age 30 and below. We then prospectively applied the RANNs to fMRI data from the remaining sample of 227 adults of age 31 and above in order to classify each subject-task map into one of the 4 possible reference domains. Overall classification accuracy across subjects in the sample age 31 and above was 0.80±0.18. Classification accuracy by RA domain was also good, but variable; memory: 0.72±0.32; reasoning: 0.75±0.35; speed: 0.79±0.31; vocabulary: 0.94±0.16. Classification accuracy was not associated with cross-sectional age, suggesting that these networks, and their specificity to the respective reference domain, might remain intact throughout the age range. Higher mean brain volume was correlated with increased overall classification accuracy; better overall performance on the tasks in the scanner was also associated with classification accuracy. For the RANN network scores, we observed for each RANN that a higher score was associated with a higher corresponding classification accuracy for that reference ability. Despite the absence of behavioral performance information in the derivation of these networks, we also observed some brain-behavioral correlations, notably for the fluid-reasoning network whose network score correlated with performance on the memory and fluid-reasoning tasks. While age did not influence the expression of this RANN, the slope of the association between network score and fluid-reasoning performance was negatively associated with higher ages. These results provide support for the hypothesis that a set of specific, age-invariant neural networks underlies these four RAs, and that these networks maintain their cognitive specificity and level of intensity across age. Activation common to all 12 tasks was identified as another activation pattern resulting from a mean-contrast Partial-Least-Squares technique. This common pattern did show associations with age and some subject demographics for some of the reference domains, lending support to the overall conclusion that aspects of neural processing that are specific to any cognitive reference ability stay constant across age, while aspects that are common to all reference abilities differ across age. Copyright © 2015 Elsevier Inc. All rights reserved.

EUV wavefront metrology system in EUVA

NASA Astrophysics Data System (ADS)

Hasegawa, Takayuki; Ouchi, Chidane; Hasegawa, Masanobu; Kato, Seima; Suzuki, Akiyoshi; Sugisaki, Katsumi; Murakami, Katsuhiko; Saito, Jun; Niibe, Masahito

2004-05-01

An Experimental extreme ultraviolet (EUV) interferometer (EEI) using an undulator as a light source was installed in New SUBARU synchrotron facility at Himeji Institute of Technology (HIT). The EEI can evaluate the five metrology methods reported before. (1) A purpose of the EEI is to determine the most suitable method for measuring the projection optics of EUV lithography systems for mass production tools.

Nuclear Technology. Course 27: Metrology. Module 27-4, Angle Measurement Instruments, Optical Projections and Surface Texture Gages.

ERIC Educational Resources Information Center

Selleck, Ben; Espy, John

This fourth in a series of eight modules for a course titled Metrology describes the universal bevel protractor and the sine bar, the engineering microscope and optical projector, and several types of surface texture gages. The module follows a typical format that includes the following sections: (1) introduction, (2) module prerequisites, (3)…

77 FR 6586 - GE Oil & Gas Operations, LLC Including On-Site Leased Workers From Adecco, Argus Technical, Inc...

Federal Register 2010, 2011, 2012, 2013, 2014

2012-02-08

..., LLC Including On-Site Leased Workers From Adecco, Argus Technical, Inc., Fox Valley Metrology URS Corp... the certification for workers of the subject firm. New information shows that workers leased from Fox... from Fox Valley Metrology, URS Corp. and CompuCom working on-site at the Oshkosh, Wisconsin location of...

Quantum Communications Systems

DTIC Science & Technology

2012-09-21

metrology practical. The strategy was to develop robust photonic quantum states and sensors serving as an archetype for loss-tolerant information...communications and metrology. Our strategy consisted of developing robust photonic quantum states and sensors serving as an archetype for loss-tolerant...developed atomic memories in caesium vapour, based on a stimulated Raman transition, that have demonstrated a TBP greater than 1000 and are uniquely suited

Metrological approach to quantitative analysis of clinical samples by LA-ICP-MS: A critical review of recent studies.

PubMed

Sajnóg, Adam; Hanć, Anetta; Barałkiewicz, Danuta

2018-05-15

Analysis of clinical specimens by imaging techniques allows to determine the content and distribution of trace elements on the surface of the examined sample. In order to obtain reliable results, the developed procedure should be based not only on the properly prepared sample and performed calibration. It is also necessary to carry out all phases of the procedure in accordance with the principles of chemical metrology whose main pillars are the use of validated analytical methods, establishing the traceability of the measurement results and the estimation of the uncertainty. This review paper discusses aspects related to sampling, preparation and analysis of clinical samples by laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) with emphasis on metrological aspects, i.e. selected validation parameters of the analytical method, the traceability of the measurement result and the uncertainty of the result. This work promotes the introduction of metrology principles for chemical measurement with emphasis to the LA-ICP-MS which is the comparative method that requires studious approach to the development of the analytical procedure in order to acquire reliable quantitative results. Copyright © 2018 Elsevier B.V. All rights reserved.

Surface slope metrology of highly curved x-ray optics with an interferometric microscope

NASA Astrophysics Data System (ADS)

Gevorkyan, Gevork S.; Centers, Gary; Polonska, Kateryna S.; Nikitin, Sergey M.; Lacey, Ian; Yashchuk, Valeriy V.

2017-09-01

The development of deterministic polishing techniques has given rise to vendors that manufacture high quality threedimensional x-ray optics. The surface metrology on these optics remains a difficult task. For the fabrication, vendors usually use unique surface metrology tools, generally developed on site, that are not available in the optical metrology labs at x-ray facilities. At the Advanced Light Source X-Ray Optics Laboratory, we have developed a rather straightforward interferometric-microscopy-based procedure capable of sub microradian characterization of sagittal slope variation of x-ray optics for two-dimensionally focusing and collimating (such as ellipsoids, paraboloids, etc.). In the paper, we provide the mathematical foundation of the procedure and describe the related instrument calibration. We also present analytical expression describing the ideal surface shape in the sagittal direction of a spheroid specified by the conjugate parameters of the optic's beamline application. The expression is useful when analyzing data obtained with such optics. The high efficiency of the developed measurement and data analysis procedures is demonstrated in results of measurements with a number of x-ray optics with sagittal radius of curvature between 56 mm and 480 mm. We also discuss potential areas of further improvement.

Quantum metrology with a transmon qutrit

NASA Astrophysics Data System (ADS)

Shlyakhov, A. R.; Zemlyanov, V. V.; Suslov, M. V.; Lebedev, A. V.; Paraoanu, G. S.; Lesovik, G. B.; Blatter, G.

2018-02-01

Making use of coherence and entanglement as metrological quantum resources allows us to improve the measurement precision from the shot-noise or quantum limit to the Heisenberg limit. Quantum metrology then relies on the availability of quantum engineered systems that involve controllable quantum degrees of freedom which are sensitive to the measured quantity. Sensors operating in the qubit mode and exploiting their coherence in a phase-sensitive measurement have been shown to approach the Heisenberg scaling in precision. Here, we show that this result can be further improved by operating the quantum sensor in the qudit mode, i.e., by exploiting d rather than two levels. Specifically, we describe the metrological algorithm for using a superconducting transmon device operating in a qutrit mode as a magnetometer. The algorithm is based on the base-3 semiquantum Fourier transformation and enhances the quantum theoretical performance of the sensor by a factor of 2. Even more, the practical gain of our qutrit implementation is found in a reduction of the number of iteration steps of the quantum Fourier transformation by the factor ln(2 )/ln(3 )≈0.63 compared to the qubit mode. We show that a two-tone capacitively coupled radio-frequency signal is sufficient for implementation of the algorithm.

Relativistic Quantum Metrology: Exploiting relativity to improve quantum measurement technologies

PubMed Central

Ahmadi, Mehdi; Bruschi, David Edward; Sabín, Carlos; Adesso, Gerardo; Fuentes, Ivette

2014-01-01

We present a framework for relativistic quantum metrology that is useful for both Earth-based and space-based technologies. Quantum metrology has been so far successfully applied to design precision instruments such as clocks and sensors which outperform classical devices by exploiting quantum properties. There are advanced plans to implement these and other quantum technologies in space, for instance Space-QUEST and Space Optical Clock projects intend to implement quantum communications and quantum clocks at regimes where relativity starts to kick in. However, typical setups do not take into account the effects of relativity on quantum properties. To include and exploit these effects, we introduce techniques for the application of metrology to quantum field theory. Quantum field theory properly incorporates quantum theory and relativity, in particular, at regimes where space-based experiments take place. This framework allows for high precision estimation of parameters that appear in quantum field theory including proper times and accelerations. Indeed, the techniques can be applied to develop a novel generation of relativistic quantum technologies for gravimeters, clocks and sensors. As an example, we present a high precision device which in principle improves the state-of-the-art in quantum accelerometers by exploiting relativistic effects. PMID:24851858

Relativistic quantum metrology: exploiting relativity to improve quantum measurement technologies.

PubMed

Ahmadi, Mehdi; Bruschi, David Edward; Sabín, Carlos; Adesso, Gerardo; Fuentes, Ivette

2014-05-22

We present a framework for relativistic quantum metrology that is useful for both Earth-based and space-based technologies. Quantum metrology has been so far successfully applied to design precision instruments such as clocks and sensors which outperform classical devices by exploiting quantum properties. There are advanced plans to implement these and other quantum technologies in space, for instance Space-QUEST and Space Optical Clock projects intend to implement quantum communications and quantum clocks at regimes where relativity starts to kick in. However, typical setups do not take into account the effects of relativity on quantum properties. To include and exploit these effects, we introduce techniques for the application of metrology to quantum field theory. Quantum field theory properly incorporates quantum theory and relativity, in particular, at regimes where space-based experiments take place. This framework allows for high precision estimation of parameters that appear in quantum field theory including proper times and accelerations. Indeed, the techniques can be applied to develop a novel generation of relativistic quantum technologies for gravimeters, clocks and sensors. As an example, we present a high precision device which in principle improves the state-of-the-art in quantum accelerometers by exploiting relativistic effects.

Kite: Status of the External Metrology Testbed for SIM

NASA Technical Reports Server (NTRS)

Dekens, Frank G.; Alvarez-Salazar, Oscar; Azizi, Alireza; Moser, Steven; Nemati, Bijan; Negron, John; Neville, Timothy; Ryan, Daniel

2004-01-01

Kite is a system level testbed for the External Metrology system of the Space Interferometry Mission (SIM). The External Metrology System is used to track the fiducial that are located at the centers of the interferometer's siderostats. The relative changes in their positions needs to be tracked to tens of picometers in order to correct for thermal measurements, the Kite testbed was build to test both the metrology gauges and out ability to optically model the system at these levels. The Kite testbed is an over-constraint system where 6 lengths are measured, but only 5 are needed to determine the system. The agreement in the over-constrained length needs to be on the order of 140 pm for the SIM Wide-Angle observing scenario and 8 pm for the Narrow-Angle observing scenario. We demonstrate that we have met the Wide-Angle goal with our current setup. For the Narrow-Angle case, we have only reached the goal for on-axis observations. We describe the testbed improvements that have been made since our initial results, and outline the future Kite changes that will add further effects that SIM faces in order to make the testbed more SIM like.

Assessing the Analytical Performance of Systems for Self-Monitoring of Blood Glucose: Concepts of Performance Evaluation and Definition of Metrological Key Terms

PubMed Central

Schnell, Oliver; Hinzmann, Rolf; Kulzer, Bernd; Freckmann, Guido; Erbach, Michael; Lodwig, Volker; Heinemann, Lutz

2013-01-01

Reliability of blood glucose (BG) measurements is a prerequisite for successful diabetes management. Publications on the evaluation of self-monitored glucose values, however, are frequently characterized by a confusion in terminology. We provide an inventory of key terms such as accuracy, trueness, precision, traceability, calibration, and matrix effect to avoid future misunderstanding. Definitions are taken from the metrological literature and international norms and explained in a language intended for nonspecialists in metrology. The terms are presented in light of the need to apply generally accepted definitions. In addition, a description of requirements and components for a sound evaluation of BG measurement systems is presented. These factors will also enable improvement in future comparisons of study results. PMID:24351185

Statistical model for speckle pattern optimization.

PubMed

Su, Yong; Zhang, Qingchuan; Gao, Zeren

2017-11-27

Image registration is the key technique of optical metrologies such as digital image correlation (DIC), particle image velocimetry (PIV), and speckle metrology. Its performance depends critically on the quality of image pattern, and thus pattern optimization attracts extensive attention. In this article, a statistical model is built to optimize speckle patterns that are composed of randomly positioned speckles. It is found that the process of speckle pattern generation is essentially a filtered Poisson process. The dependence of measurement errors (including systematic errors, random errors, and overall errors) upon speckle pattern generation parameters is characterized analytically. By minimizing the errors, formulas of the optimal speckle radius are presented. Although the primary motivation is from the field of DIC, we believed that scholars in other optical measurement communities, such as PIV and speckle metrology, will benefit from these discussions.

Metrologies for quantitative nanomechanical testing and quality control in semiconductor manufacturing

NASA Astrophysics Data System (ADS)

Pratt, Jon R.; Kramar, John A.; Newell, David B.; Smith, Douglas T.

2005-05-01

If nanomechanical testing is to evolve into a tool for process and quality control in semiconductor fabrication, great advances in throughput, repeatability, and accuracy of the associated instruments and measurements will be required. A recent grant awarded by the NIST Advanced Technology Program seeks to address the throughput issue by developing a high-speed AFM-based platform for quantitative nanomechanical measurements. The following paper speaks to the issue of quantitative accuracy by presenting an overview of various standards and techniques under development at NIST and other national metrology institutes (NMIs) that can provide a metrological basis for nanomechanical testing. The infrastructure we describe places firm emphasis on traceability to the International System of Units, paving the way for truly quantitative, rather than qualitative, physical property testing.

Metrological assurance and traceability for Industry 4.0 and additive manufacturing in Ukraine

NASA Astrophysics Data System (ADS)

Skliarov, Volodymyr; Neyezhmakov, Pavel; Prokopov, Alexander

2018-03-01

The national measurement standards from the point of view of traceability of the results of measurement in additive manufacturing in Ukraine are considered in the paper. The metrological characteristics of the national primary measurement standards in the field of geometric, temperature, optical-physical and time-frequency measurements, which took part in international comparisons within COOMET projects, are presented. The accurate geometric, temperature, optical-physical and time-frequency measurements are the key ones in controlling the quality of additive manufacturing. The use of advanced CAD/CAE/CAM systems allows to simulate the process of additive manufacturing at each stage. In accordance with the areas of the technology of additive manufacturing, the ways of improving the national measurement standards of Ukraine for the growing needs of metrology of additive manufacturing are considered.

Miniaturization as a key factor to the development and application of advanced metrology systems

NASA Astrophysics Data System (ADS)

Furlong, Cosme; Dobrev, Ivo; Harrington, Ellery; Hefti, Peter; Khaleghi, Morteza

2012-10-01

Recent technological advances of miniaturization engineering are enabling the realization of components and systems with unprecedented capabilities. Such capabilities, which are significantly beneficial to scientific and engineering applications, are impacting the development and the application of optical metrology systems for investigations under complex boundary, loading, and operating conditions. In this paper, and overview of metrology systems that we are developing is presented. Systems are being developed and applied to high-speed and high-resolution measurements of shape and deformations under actual operating conditions for such applications as sustainability, health, medical diagnosis, security, and urban infrastructure. Systems take advantage of recent developments in light sources and modulators, detectors, microelectromechanical (MEMS) sensors and actuators, kinematic positioners, rapid prototyping fabrication technologies, as well as software engineering.