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Sample records for semi-insulating gaas doped

  1. Depth uniformity of electrical properties and doping limitation in neutron-transmutation-doped semi-insulating GaAs

    SciTech Connect

    Satoh, M.; Kuriyama, K. ); Kawakubo, T. )

    1990-04-01

    Depth uniformity of electrical properties has been evaluated for neutron-transmutation-doped (NTD), semi-insulating GaAs irradiated with thermal neutrons of 1.5{times}10{sup 18} cm{sup {minus}2} by the van der Pauw method combined with iterative etching of the surface. In NTD-GaAs wafers (thickness {similar to}410 {mu}m) annealed for 30 min at 700 {degree}C, the depth profiles of the resistivity, the carrier concentration, and the Hall mobility show constant values of 1{times}10{sup {minus}2} {Omega} cm, 2.0{times}10{sup 17} cm{sup {minus}3}, and 3100 cm{sup 2}/V s, respectively, within an experimental error of 5%. In an annealing process, the redistribution and/or the segregation of NTD impurities is not observed. We also discuss the limitations of low-level NTD in semi-insulating GaAs. It is suggested that the activation of the NTD-impurities below {similar to}1{times}10{sup 16} cm{sup {minus}3} is mainly restricted by the presence of the midgap electron trap (EL2).

  2. Effect of the V{sub As}V{sub Ga} complex defect doping on properties of the semi-insulating GaAs

    SciTech Connect

    Ma, Deming Qiao, Hongbo; Shi, Wei; Li, Enling

    2014-04-21

    The different position V{sub As}V{sub Ga} cluster defect doping in semi-insulating (SI) GaAs has been studied by first-principles calculation based on hybrid density functional theory. Our calculated results show that EL6 level is formed due to the V{sub As}V{sub Ga} complex defect, which is very close to the experimental result. It provides the explanation of the absorption of laser with the wavelength beyond in semi-insulating GaAs. The formation energy of V{sub As}V{sub Ga} complex defect is found to decrease from surface to interior gradually. The conduction band minima and valence band maxima of GaAs (001) surface with the V{sub As}V{sub Ga} complex defect are all located at Γ point, and some defect levels are produced in the forbidden band. In contrast, the conduction band minima and valence band maxima of GaAs with the interior V{sub As}V{sub Ga} complex defect are not located at the same k-point, so it might involve the change of momentum in the electron transition process. The research will help strengthen the understanding of photoelectronic properties and effectively guide the preparation of the SI-GaAs materials.

  3. Characterisation of semi-insulating GaAs

    NASA Technical Reports Server (NTRS)

    Walukiewicz, W.; Pawlowicz, L.; Lagowski, J.; Gatos, H. C.

    1982-01-01

    Hole and electron mobilities as functions of temperature and ionised impurity concentration are calculated for GaAs. It is shown that these calculations, when used to analyse electrical properties of semi-insulating GaAs, enable an assessment of the Fermi energy position and ionised impurity concentration to be made. In contrast to previous work, the analysis does not require any phenomenological assumptions.

  4. Slow domains in semi-insulating GaAs

    SciTech Connect

    Neumann, A.

    2001-07-01

    Semi-insulating GaAs shows current oscillations if a high dc voltage is applied to a sample. These oscillations are caused by traveling high-electric-field domains that are formed as a result of electric-field-enhanced electron trapping. This article describes the various types of experiments that have been carried out with this system, including recent ones that use the electro-optic Pockels effect in order to measure the local electric fields in the sample in a highly accurate manner. An historical overview of the theoretical developments is given and shows that no satisfying theory is currently available. A list of all the required ingredients for a successful theory is provided and the experimental data are explained in a qualitative manner. Furthermore, the main electron trap in semi-insulating GaAs is the native defect EL2, the main properties of which are described. {copyright} 2001 American Institute of Physics.

  5. Deep levels in semi-insulating LEC GaAs before and after silicon implantation

    SciTech Connect

    Dindo, S.; Abdel-Motaleb, I.; Lowe, K.; Tang, W.; Young, L.

    1985-11-01

    The deep trapping levels present before ion implantation of silicon into the semi-insulating LEC GaAs starting material were investigated using optical transient current spectroscopy (OTCS). MESFET channel current deep level transient spectroscopy (DLTS) was used for the implanted material. With a silicon nitride layer used t encapsulate the GaAs for postimplantation annealing and with implantation directly into the GaAs, it was found tha of seven or more deep levels seen in the semi-insulating substrate prior to silicon implantation only the level believed to be EL12 remained. On implanting through a thin Si/sub 3/N/sub 4/ encapsulating layer and annealing under Si/sub 3/N/sub 4/, only EL2 was found. With a silicon dioxide layer as an encapsulant, two traps remained and two apparently unreported levels appeared.

  6. Role of electrode metallization in performance of semi-insulating GaAs radiation detectors

    NASA Astrophysics Data System (ADS)

    Dubecký, František; Boháček, Pavol; Sekáčová, Mária; Zaťko, Bohumír; Lalinský, Tibor; Linhart, Vladimír; Šagátová-Perd'ochová, Andrea; Mudroň, Ján; Pospíšil, Stanislav

    2007-06-01

    In the present work, a comparative study of semi-insulating (SI) GaAs radiation detectors with different blocking (Schottky) and ohmic contact metallization is presented. The detectors fabricated from "detector-grade" bulk SI GaAs are characterized by current-voltage measurements and their detection performance is evaluated from pulse-height spectra of 241Am and 57Co γ-sources. Observed results are evaluated and discussed. Importance of the optimized electrodes technology of SI GaAs detector with good performance is demonstrated.

  7. 20 THz broadband generation using semi-insulating GaAs interdigitated photoconductive antennas.

    PubMed

    Hale, P J; Madeo, J; Chin, C; Dhillon, S S; Mangeney, J; Tignon, J; Dani, K M

    2014-10-20

    We demonstrate broadband (20 THz), high electric field, terahertz generation using large area interdigitated antennas fabricated on semi-insulating GaAs. The bandwidth is characterized as a function of incident pulse duration (15-35 fs) and pump energy (2-30 nJ). Broadband spectroscopy of PTFE is shown. Numerical Drude-Lorentz simulations of the generated THz pulses are performed as a function of the excitation pulse duration, showing good agreement with the experimental data.

  8. Native and irradiation-induced monovacancies in n -type and semi-insulating GaAs

    SciTech Connect

    Corbel, C.; Pierre, F. ); Hautojaervi, P.; Saarinen, K. ); Moser, P. )

    1990-05-15

    Defects induced by electron irradiation in semi-insulating and {ital n}-type GaAs crystals have been characterized by positron-lifetime measurements. We conclude that electron irradiation with energies of 1.5--3 MeV produces negative monovacancies and negative ions at low and room temperature. The results also show that the native monovacancy defects in lightly {ital n}-type GaAs change their properties under irradiation. We relate this change to the existence of an ionization level {minus}{r arrow}0 or 0{r arrow}+ of the native monovacancy defects in the upper half of the band gap. We propose that irradiation produces negative Ga{sub As} antisites and negative {ital V}{sub Ga} vacancies. In {ital n}-type GaAs the behavior of the native defects under irradiation is in agreement with their earlier assignment to {ital V}{sub As}.

  9. ``EL2'' revisited: Observation of metastable and stable energy levels of EL2 in semi-insulating GaAs

    NASA Astrophysics Data System (ADS)

    Kabiraj, D.; Ghosh, Subhasis

    2005-12-01

    By using a combination of detailed experimental studies, we identify the metastable and stable energy levels of EL2 in semi-insulating GaAs. These results are discussed in light of the recently proposed models for EL2 in GaAs.

  10. Carbon irradiated semi insulating GaAs for photoconductive terahertz pulse detection

    NASA Astrophysics Data System (ADS)

    Singh, Abhishek; Pal, Sanjoy; Surdi, Harshad; Prabhu, S. S.; Mathimalar, S.; Nanal, Vandana; Pillay, R. G.; Döhler, G. H.

    2015-03-01

    We report here a photoconductive material for THz generation and detection with sub-picosecond carrier lifetime made by C12 (Carbon) irradiation on commercially available semi-insulating (SI) GaAs. We are able to reduce the carrier lifetime of SI-GaAs down to sub-picosecond by irradiating it with various irradiation dosages of Carbon (C12) ions. With an increase of the irradiation dose from ~1012 /cm2 to ~1015 /cm2 the carrier lifetime of SI-GaAs monotonously decreases to 0.55 picosecond, resulting in strongly improved THz pulse detection compared with normal SI-GaAs.

  11. Photoquenching phenomenon enhanced by proton irradiation in semi-insulating GaAs

    SciTech Connect

    Kuriyama, K.; Takahashi, H.; Kawahara, H. ); Hayashi, N.; Watanabe, H.; Sakamoto, I. ); Kohno, I. )

    1990-12-15

    In undoped semi-insulating GaAs, we have found that the quenching phenomena of photoconductance and infrared absorption are enhanced by proton irradiation above 10{sup 13} /cm{sup 2}, accompanied by an increase in near-band-edge infrared absorption. These phenomena disappear with the annihilation of the proton-induced near-band absorption by annealing at 350 {degree}C. It is suggested that the enhanced photoquenching phenomena arise from the increase in the quenchable component due to the transition from the ionized midgap electron trap (EL2{sup +}) to the neutral EL2{sup 0}.

  12. Complete set of deep traps in semi-insulating GaAs

    NASA Astrophysics Data System (ADS)

    Pavlović, M.; Desnica, U. V.; Gladić, J.

    2000-10-01

    Reevaluation and recalculation of thermally stimulated current (TSC) data from semi-insulating (SI) GaAs, published by many different authors over a period of three decades were done by means of the new analytical method, simultaneous multiple peak analysis (SIMPA). The SIMPA procedure clearly resolved contributions from various overlapping TSC peaks and enabled the precise determination of signatures (activation energy, Ea and capture cross section, σ) of all observed deep traps. The analyzed TSC spectra refer to SI GaAs samples that have been grown/treated in quite different ways (various growth techniques, growth under As or Ga rich conditions, different annealing procedures, irradiation with neutrons, γ rays, etc.). Although the SIMPA procedure was applied to apparently quite different TSC spectra, in all cases excellent fits were achieved, with the unique set (or subset from it) of eleven different deep traps, the only difference being in relative and absolute concentrations of traps. Despite a broad variety of samples analyzed in this article, the set of deep traps obtained is the same as the one being previously seen in the narrow range of SI GaAs samples. This finding suggests that this set of traps is a finite and complete set of all defects with deep levels in SI GaAs. It was also concluded that these defects are primarily complexes containing simple native defects.

  13. Light controlled prebreakdown characteristics of a semi-insulating GaAs photoconductive switch

    NASA Astrophysics Data System (ADS)

    Xiangrong, Ma; Wei, Shi; Weili, Ji; Hong, Xue

    2011-12-01

    A 4 mm gap semi-insulating (SI) GaAs photoconductive switch (PCSS) was triggered by a pulse laser with a wavelength of 1064 nm and a pulse energy of 0.5 mJ. In the experiment, when the bias field was 4 kV, the switch did not induce self-maintained discharge but worked in nonlinear (lock-on) mode. The phenomenon is analyzed as follows: an exciton effect contributes to photoconduction in the generation and dissociation of excitons. Collision ionization, avalanche multiplication and the exciton effect can supply carrier concentration and energy when an outside light source was removed. Under the combined influence of these factors, the SI-GaAs PCSS develops into self-maintained discharge rather than just in the light-controlled prebreakdown status. The characteristics of the filament affect the degree of damage to the switch.

  14. Effects of macroscopic inhomogeneities on electron mobility in semi-insulating GaAs

    NASA Technical Reports Server (NTRS)

    Walukiewicz, W.; Wang, L.; Pawlowicz, L. M.; Lagowski, J.; Gatos, H. C.

    1986-01-01

    It is shown that defect inhomogeneities of sizes larger than the electron mean free path are responsible for the low values and anomalous temperature dependence of the electron mobility in semi-insulating (SI) GaAs. The room-temperature electron mobility values below about 6000 sq cm/V s cannot be uniquely used for the determination of the concentration of ionized defects, since the contribution from inhomogeneities usually exceeds that from scattering by ionized impurities. The effects of the macroscopically inhomogeneous distribution of residual acceptors and the major deep donor EL2 diminish at elevated temperatures between 600 and 900 K, which offers a means for identification of inhomogeneities, and furthermore explains recently reported steplike mobility versus temperature behavior in SI-GaAs.

  15. Effects of macroscopic inhomogeneities on electron mobility in semi-insulating GaAs

    SciTech Connect

    Walukiewicz, W.; Wang, L.; Pawlowicz, L.M.; Lagowski, J.; Gatos, H.C.

    1986-05-01

    We show that defect inhomogeneities of sizes larger than the electron mean free path are responsible for the low values and anomalous temperature dependence of the electron mobility in semi-insulating (SI) GaAs. The room-temperature electron mobility values below about 6000 cm/sup 2//V s cannot be uniquely used for the determination of the concentration of ionized defects, since the contribution from inhomogeneities usually exceeds that from scattering by ionized impurities. The effects of the macroscopically inhomogeneous distribution of residual acceptors and the major deep donor EL2 diminish at elevated temperatures between 600 and 900 K, which offers a means for identification of inhomogeneities, and furthermore explains recently reported steplike mobility versus temperature behavior in SI-GaAs.

  16. Characterization of semi-insulating GaAs by photoreflectance and photoluminescence

    SciTech Connect

    Durbin, C.M.

    1992-12-31

    Semi-insulating (SI) GaAs was characterized using photoreflectance, a modulation spectroscopy technique. Anomalous splitting was observed in the photoreflectance (PR) response of SI:GaAs in the vicinity of the exciton at 78 K. Recent photoluminescence (PL) measurements suggest the splitting is correlated with the EL2 content of the samples. Separation between the two peaks in PR measurements range from about 2 to 4 meV. A striking effect is that each peak is maximized by a different phase setting of the lock-in. The splitting is sample dependent and is also affected by several other factors including surface conditions, temperature, pump beam intensity and modulation frequency.

  17. Evidence for field enhanced electron capture by EL2 centers in semi-insulating GaAs and the effect on GaAs radiation detectors

    SciTech Connect

    McGregor, D.S.; Rojeski, R.A.; Knoll, G.F. ); Terry, F.L. Jr.; East, J. ); Eisen, Y. )

    1994-06-15

    The performance of Schottky contact semiconductor radiation detectors fabricated from semi-insulating GaAs is highly sensitive to charged impurities and defects in the material. The observed behavior of semi-insulating GaAs Schottky barrier alpha particle detectors does not match well with models that treat the semi-insulating material as either perfectly intrinsic or as material with deep donors (EL2) of constant capture cross section compensated with shallow acceptors. We propose an explanation for the discrepancy based on enhanced capture of electrons by EL2 centers at high electric fields and the resulting formation of a quasineutral region in the GaAs. Presented is a simple model including field enhanced electron capture which shows good agreement with experimental alpha particle pulse height measurements.

  18. Gettering of donor impurities by V in GaAs and the growth of semi-insulating crystals

    NASA Technical Reports Server (NTRS)

    Ko, K. Y.; Lagowski, J.; Gatos, H. C.

    1989-01-01

    Vanadium added to the GaAs melt getters shallow donor impurities (Si and S) and decreases their concentration in the grown crystals. This gettering is driven by chemical reactions in the melt rather than in the solid. Employing V gettering, reproducibly semi-insulating GaAs were grown by horizontal Bridgman and liquid-encapsulated Czochralski techniques, although V did not introduce any midgap energy levels. The compensation mechanism in these crystals was controlled by the balance between the native midgap donor EL2 and residual shallow acceptors. Vanadium gettering contributed to the reduction of the concentration of shallow donors below the concentration of acceptors. The present findings clarify the long-standing controversy on the role of V in achieving semi-insulating GaAs.

  19. Carbon irradiated semi insulating GaAs for photoconductive terahertz pulse detection.

    PubMed

    Singh, Abhishek; Pal, Sanjoy; Surdi, Harshad; Prabhu, S S; Mathimalar, S; Nanal, Vandana; Pillay, R G; Döhler, G H

    2015-03-09

    We report here a photoconductive material for THz detection with sub-picosecond carrier lifetime made by C(12) (Carbon) irradiation on commercially available semi-insulating (SI) GaAs. We are able to reduce the carrier lifetime of SI-GaAs down to sub-picosecond by irradiating it with various irradiation dosages of Carbon (C(12)) ions. With an increase of the irradiation dose from ~10(12) /cm(2) to ~10(15) /cm(2) the carrier lifetime of SI-GaAs monotonously decreases to 0.55 picosecond, whereas that of usual non-irradiated SI-GaAs is ~70 picosecond. This decreased carrier lifetime has resulted in a strong improvement in THz pulse detection compared with normal SI-GaAs. Improvement in signal to noise ratio as well as in detection bandwidth is observed. Carbon irradiated SI-GaAs appears to be an economical alternative to low temperature grown GaAs for fabrication of THz devices.

  20. Controlling chaos with magnetic field in semi-insulating GaAs

    SciTech Connect

    Oliveira, A. G. de; Ribeiro, G. M.; Moreira, M. V. B.; Gonzalez, J. C.; Silva, R. L. da; Rubinger, R. M.

    2007-10-15

    Chaos control has stimulated a large amount of work. We have studied the effect of an external parallel magnetic field on the low-frequency current oscillations observed on a molecular beam epitaxy GaAs sample grown at 265 deg. C, and we have shown that it can be efficiently used for chaos control. The study of the magnetoresistance indicates that the effect of the magnetic field on the charges of the hopping conduction mechanism induces changes in the low-frequency oscillations. Due to this, we have used the magnetic field to control chaos assessed through direct observation low-frequency oscillations, their attractors, and bifurcation diagrams. We also found that the magnetic field interferes indirectly with the Coulombian interaction between the free charges in the conduction band and the hopping carriers, as well as with the recombination mechanism of field enhanced trapping. Controlling the low-frequency oscillations in semi-insulating GaAs by means of an external magnetic field permits probing the interaction of the slow hopping carriers and the fast free carriers in the electric-field domains.

  1. Introduction of metastable vacancy defects in electron-irradiated semi-insulating GaAs

    SciTech Connect

    Saarinen, K.; Kuisma, S.; Maekinen, J.; Hautojaervi, P.; Toernqvist, M.; Corbel, C.

    1995-05-15

    Positron-lifetime experiments have been performed to investigate the metastability of the point defects produced in the electron irradiation of semi-insulating GaAs. The measurements in darkness indicate the presence of Ga vacancies and Ga antisite defects in a negative charge state. Illumination at 25 K reveals another type of a defect, which has a vacancy in its metastable state. The metastable vacancies can be observed most effectively after illumination with 1.1-eV photons and they are persistent up to the annealing temperature of 80--100 K. The introduction rate of the metastable defects is about 0.3 cm{sup {minus}1}, which is close to the values reported earlier for the As antisite. The metastable properties of the defects resemble those of the well-known {ital EL}2 center in as-grown GaAs. We associate these defects to As antisites, which exhibit the metastability predicted by the theory: in the metastable configuration the As antisite atom relaxes away from the lattice position, leaving a Ga site vacant.

  2. Electrical properties of unintentionally doped semi-insulating and conducting 6H-SiC

    NASA Astrophysics Data System (ADS)

    Mitchel, W. C.; Mitchell, W. D.; Fang, Z. Q.; Look, D. C.; Smith, S. R.; Smith, H. E.; Khlebnikov, Igor; Khlebnikov, Y. I.; Basceri, C.; Balkas, C.

    2006-08-01

    Temperature dependent Hall effect (TDH), low temperature photoluminescence (LTPL), secondary ion mass spectrometry (SIMS), optical admittance spectroscopy (OAS), and thermally stimulated current (TSC) measurements have been made on 6H-SiC grown by the physical vapor transport technique without intentional doping. n- and p-type as well semi-insulating samples were studied to explore the compensation mechanism in semi-insulating high purity SiC. Nitrogen and boron were found from TDH and SIMS measurements to be the dominant impurities that must be compensated to produce semi-insulating properties. The electrical activation energy of the semi-insulating sample determined from the dependence of the resistivity was 1.0eV. LTPL lines near 1.00 and 1.34eV, identified with the defects designated as UD-1 and UD-3, were observed in all three samples but the intensity of the UD-1 line was almost a factor of 10 more in the n-type sample than in the the p-type sample with that in the semi-insulating sample being intermediate between those two. OAS and TSC experiments confirmed the high purity of this material. The results suggest that the relative concentrations of a dominant deep level and nitrogen and boron impurities can explain the electrical properties in this material.

  3. Investigation of the compensation mechanism in semi-insulating GaAs from alpha-spectra studies at low temperature

    SciTech Connect

    Chen, J.W.; Ebling, D.G.; Geppert, R.; Irsigler, R.; Schmid, T.; Rogalla, M.; Ludwig, J.; Runge, K.

    1997-05-01

    We present the results of charge collection measurements on liquid encapsulated Czochralski grown semi-insulating GaAs devices for alpha particles. Experimental evidence is given which demonstrates a drastic enhancement of charge collection efficiency after prolonged illumination with 1.086 {mu}m below-gap light. The recovery of EL2 from metastable state to normal state can also be achieved by electric field at high bias voltage. The experimental result shows that the EL2 defect is practically the dominant trap for free charge carriers and together with other shallow defects responsible for the electric compensation in semi-insulating GaAs. The metastable transition of the EL2 defect is always simultaneously accompanied by the neutralization of a shallow acceptor. No change in the type of conductivity was found. {copyright} {ital 1997 American Institute of Physics.}

  4. Role of deep level trapping on surface photovoltage of semi-insulating GaAs

    SciTech Connect

    Liu, Q.; Ruda, H.E.; Koutzarov, I.P.; Jedral, L.; Chen, G.; Prasad, M.

    1996-12-31

    Dual beam (bias and probe) transient Surface Photovoltage (SPV) measurements were made on undoped Semi-Insulating (SI) GaAs over an extended temperature range. Above 270 K, SPV recovery transients following a bias pulse were shown to reflect near surface conductivity changes; these are in turn controlled by surface/interface state thermal emission. Owing to the absence of a strong surface electric field in this material, the emitted carriers are not immediately removed from the near surface region. The recapturing of the emitted carriers is shown to be responsible for non-exponential conductivity and reciprocal-SPV transients. This behavior is considered to be characteristic of relaxation-type semiconductors with near-surface ungated structures. Below 150 K, the photoinduced transition of EL2 from its ground to metastable state El2* was shown to change the effective electron and hole mobilities and augment the SPV signals immediately following the bias pulse. Thermally induced EL2* recovery above 120 K decreases the SPV signal from its maximum. This decay transient was analyzed and the decay rate fitted to a single exponential. An activation energy of 0.32 eV and a pre-exponential constant of 1.9 {times} 10{sup 12} s{sup {minus}1} were obtained, and attributed to the thermal recovery rate for EL2*.

  5. On the optical evaluation of the EL2 deep level concentration in semi-insulating GaAs

    NASA Technical Reports Server (NTRS)

    Walukiewicz, W.; Lagowski, J.; Gatos, H. C.

    1983-01-01

    A practical procedure for the evaluation of the Fermi energy in semi-insulating (SI)GaAs from electrical measurements is presented. This procedure makes it possible to reliably extend the determination of the major deep level (EL2) concentration, by near-infrared absorption measurements, to SIGaAs. Employing this procedure, it is shown that the EL2 concentration in Czochralski-grown GaAs increases monotonically with increasing As/Ga ratio (throughout the conversion from SI n type to semiconducting p-type crystals) rather than abruptly as previously proposed.

  6. Continuous wave terahertz radiation from antennas fabricated on C¹²-irradiated semi-insulating GaAs.

    PubMed

    Deshmukh, Prathmesh; Mendez-Aller, M; Singh, Abhishek; Pal, Sanjoy; Prabhu, S S; Nanal, Vandana; Pillay, R G; Döhler, G H; Preu, S

    2015-10-01

    We demonstrate continuous wave (CW) terahertz generation from antennas fabricated on C12-irradiated semi-insulating (SI) GaAs substrates. The dark current drawn by the antennas fabricated on irradiated substrates is ∼3 to 4 orders of magnitude lower compared to antennas fabricated on un-irradiated substrates, while the photocurrents decrease by only ∼1.5 orders of magnitude. This can be attributed to the strong reduction of the carrier lifetime that is 2.5 orders of magnitude, with values around τ(rec)=0.2  ps. Reduced thermal heating allows for higher bias voltages to the irradiated antenna devices resulting in higher CW terahertz power, just slightly lower than that of low-temperature grown GaAs (LT GaAs)at similar excitation conditions.

  7. Fe-doping in hydride vapor-phase epitaxy for semi-insulating gallium nitride

    NASA Astrophysics Data System (ADS)

    Richter, E.; Gridneva, E.; Weyers, M.; Tränkle, G.

    2016-12-01

    Fe-doping of GaN layers of 3 in. in diameter and a thickness of 1 mm in a vertical AIX-HVPE reactor is studied. Ferrocen was used as Fe source. It is shown that a sufficient uniformity of growth conditions, a high purity of undoped GaN layers, and a moderate Fe incorporation of 2×1018 cm-3 allow for growth of semi-insulating GaN layers with a sufficiently high specific resistivity even at elevated temperature. This makes the material suitable as substrate for electronic power devices at high power or in harsh ambient.

  8. Photoresistances of semi-insulating GaAs photoconductive switch illuminated by 1.064 μm laser pulse

    NASA Astrophysics Data System (ADS)

    Wu, Minghe; Zheng, Xiaoming; Ruan, Chengli; Yang, Hongchun; Sun, Yunqing; Wang, Shan; Zhang, Kedi; Liu, Hong

    2009-07-01

    The Shockley-Read-Hall model (SRHM) and its simplified model (SSRHM) were used to describe the characteristics of a photoconductive semiconductor switch (PCSS) made from a semi-insulating (SI) gallium arsenide (GaAs) chip, biased at low voltage, and illuminated by a 1.064 μm laser pulse. These characteristics include the free carrier densities, dynamic photoresistance, and time evolution of output pulses of the PCSS. The deep donor EL2 centers in SI GaAs play a dominant role in both the SRHM and SSRHM as electrons at EL2 unionized centers are strongly excited by the subband-gap photons at the wavelength of 1.064 μm. Theoretical modeling on the evolution of the experimental measured output pulses led to a two-step micromechanism of electron excitation process within the GaAs chip. The minimum photoresistances predicted by the SSRHM are in good agreement with experimental measurements, which confirms the dominant role of EL2 in the generation of electric pulses from a SI GaAs photoconductivity switch on which the 1064 nm laser pulse is illuminated.

  9. Precise determination of deep trap signatures and their relative and absolute concentrations in semi-insulating GaAs

    NASA Astrophysics Data System (ADS)

    Pavlović, M.; Desnica, U. V.

    1998-08-01

    The new analytical method, simultaneous multiple peak analysis (SIMPA) which comprises simultaneous fitting of whole measured thermally stimulated current (TSC) spectra is presented. The procedure clearly resolves contributions from various overlapping TSC peaks, which results in precise determination of trap parameters (signature) for each trap. In combination with photocurrent temperature dependent measurements, IPC(T), which reflects free carrier lifetime temperature dependence, the estimates of relative and absolute trap concentrations were made as well. The advantage of the SIMPA method in comparison with the single peak approach was demonstrated and analyzed. The SIMPA method was applied to different semi-insulating (SI) GaAs samples, particularly to samples having very high and others having very low deep trap concentrations; and for both extremes excellent fits were achieved. The method also seems very promising for characterization of deep levels and other similar SI materials, like SI InP or SI CdTe.

  10. Distributions of residual stress, dislocations, and EL2 in Czochralski-grown semi-insulating GaAs

    SciTech Connect

    Dobrilla, P.; Blakemore, J.S.

    1986-07-01

    Distributions of stress, dislocations, and the EL2 midgap defect have been optically mapped in semi-insulating GaAs wafers, from (100)-grown crystals created by the liquid-encapsulated Czochralski method. The evolution of EL2 along the growth axis indicates that assessment of this property through the majority of the crystal volume is often poorly represented by wafers from near the two end regions. A comparison of maps for stress, dislocation and EL2 patterns as all measured with a given wafer does not support hypotheses that EL2 is a direct consequence either of stress or of dislocations. Other mechanisms, such as segregation and melt dynamics, thus appear more likely to control the formation and distribution of EL2.

  11. Influence of EL2 deep level on photoconduction of semi-insulating GaAs under ultrashort pulse photoinjection

    NASA Astrophysics Data System (ADS)

    Shi, Wei; Xie, Guangyong

    2016-02-01

    To investigate the influence of EL2 deep level on photoconduction of in semi-insulating GaAs (SI-GaAs), a 3 mm-electrode-gap lateral SI-GaAs photoconductive chip was manufactured and tested by using ultrashort pulse laser with 1064 nm wavelength, 10 ns pulsewidth, 3.0 mm light spot diameter and single pulse energy mean of 3.0 mJ. Based on the experimental results and the theory of trapping effect, the photon absorption process of EL2 defects in SI-GaAs is analyzed. For the influence of EL2 deep level, the lifetime of the electron gets shorter and the persistent photoconductivity (PPC) is significant. With increasing of voltage, the decay time constant of photoconduction is reduced and the decay index gets bigger for the ultrashort pulse photoinjection.

  12. Growth of double doped semi-insulating indium phosphide single crystals

    NASA Astrophysics Data System (ADS)

    Toudic, Y.; Coquillé, R.; Gauneau, M.; Grandpierre, G.; Le Maréchal, L.; Lambert, B.

    1987-05-01

    Semi-insulating (SI) InP, co-doped with a shallow acceptor (Hg or Cd) and a deep donor (Ti or Cr) has been grown by the gradient freeze method or by the liquid encapsulated Czochralski (LEC) technique. Three dopant couples have been studied: Hg+Ti, Hg+Cr and Cd+Cr. The crystals have been characterized by spark source mass spectrometry (SSMS), secondary ion mass spectrometry (SIMS) and thermally dependent Hall (TDH) effect using the Van der Pauw technique. Deduced from the activation energy measurements, the donor deep levels of titanium and chromium have been found to be at Ec-0.53 eV and Ev+0.56 eV, respectively. SIMS profiles on SI substrates annealed at 975°C show that SI InP (Ti, Hg) is more thermally stable than SI InP(Fe) and SI InP(Cr, Hg or Cd).

  13. EL2 deep level defects and above-band gap two-photon absorption in high gain lateral semi-insulating GaAs photoconductive switch

    NASA Astrophysics Data System (ADS)

    Shi, Wei; Wang, Wei; Niu, Hongjian; Zhang, Xianbin; Ji, Weili

    2005-01-01

    Experiments of a lateral semi-insulating GaAs photoconductive switch, both linear and nonlinear mode of the switch were observed when the switch was triggered by 1064 nm laser pulses, with energy of 1.9 mJ and the pulse width of 60 ns, and operated at biased electric field of 4.37 kV/cm. It"s wavelength is longer than 876nm, but the experiments indicate that the semi-insulating GaAs photoconductive switches can absorb 1064 nm laser obviously, which is out of the absorption range of the GaAs material. It is not possible to explain this behavior by using intrinsic absorption mechanism. We think that there are two mostly kinds of absorption mechanisms play a key part in absorption process, they are the two-steps-single-photon absorption that based on the EL2 energy level and two-photon absorption.

  14. Emission characteristics of photoconductive antennas based on low-temperature-grown GaAs and semi-insulating GaAs.

    PubMed

    Tani, M; Matsuura, S; Sakai, K; Nakashima, S

    1997-10-20

    Terahertz radiation was generated with several designs of photoconductive antennas (three dipoles, a bow tie, and a coplanar strip line) fabricated on low-temperature-grown (LT) GaAs and semi-insulating (SI) GaAs, and the emission properties of the photoconductive antennas were compared with each other. The radiation spectrum of each antenna was characterized with the photoconductive sampling technique. The total radiation power was also measured by a bolometer for comparison of the relative radiation power. The radiation spectra of the LT-GaAs-based and SI-GaAs-based photoconductive antennas of the same design showed no significant difference. The pump-power dependencies of the radiation power showed saturation for higher pump intensities, which was more serious in SI-GaAs-based antennas than in LT-GaAs-based antennas. We attributed the origin of the saturation to the field screening of the photocarriers.

  15. Semi-insulating GaAs based detector of fast neutrons produced by D-T nuclear reaction

    NASA Astrophysics Data System (ADS)

    Šagátová, A.; Kubanda, D.; Zat'ko, B.; Sedlačková, K.; Nečas, V.; Solar, M.; Granja, C.

    2016-12-01

    We have examined semi-insulating (SI) GaAs detectors with high density polyethylene (HDPE) conversion layer by a mono-energetic neutrons with kinetic energy of 16.755 MeV generated by a deuterium—tritium nuclear reaction. First, the influence of HDPE layer thickness on the relative detection efficiency of fast neutrons was studied. The MCNPX (Monte Carlo N-particle eXtended) code has been used to support the analysis of the experiment. The theoretical optimum thickness of the conversion layer was determined to 1.9 mm using the MCNPX code. The HDPE conversion layers of various thicknesses, in the range from 50 μ m to 3200 μ m, were glued on the top Schottky contact of SI GaAs detector in the experiment. The neutron detection efficiency was evaluated from measured spectra and compared to results from simulations. The experimental data showed very good agreement with simulation results. Then the effect of active detector thickness modified by detector reverse bias on neutron detection efficiency was studied. Finally, the effect of the angle of irradiation on neutron detection efficiency was evaluated exhibiting decreasing tendency with increasing deviation from perpendicular direction of impinging neutrons.

  16. Photoluminescence of PbS Quantum Dots on Semi-Insulating GaAs (Postprint)

    DTIC Science & Technology

    2010-07-01

    ns ity (a rb .u ni ts ) Energy (eV) 5 K 100 K 200 K 300 K InGaAs...detector. 0 20 40 60 80 100 120 140 0.20 0.40 0.60 0.80 1.00 PL in te ns ity (a rb .u ni ts ) Energy (eV) 5 K 20 K 50 K 100 K 150 K 200 K 250 K 300 K InSb...3.0 0 10 20 30 40 50 0.2 0.4 0.6 0.8 1.0 PL in te ns ity (a rb .u ni ts ) Energy (eV) SI GaAs PbS/SI GaAs5 K FIG. 4. Color online Comparison of the

  17. Gallium vacancies and gallium antisites as acceptors in electron-irradiated semi-insulating GaAs

    SciTech Connect

    Corbel, C.; Pierre, F. ); Saarinen, K.; Hautojaervi, P. ); Moser, P. )

    1992-02-15

    Positron-lifetime measurements show that acceptors are produced in semi-insulating GaAs by 1.5-MeV electron irradiation at 20 K. Two types of acceptors can be separated. The first ones are negative vacancy-type defects which anneal out over a very broad range of temperature between 77 and 500 K. The second ones are negative ion-type defects which are stable still at 450 K. The data show that these two types of defects are independent and do not form close pairs. We attribute both to gallium-related defects. We identify the ion-type acceptors as isolated gallium antisites. The vacancy-type acceptors are identified as gallium vacancies which are isolated or involved in negatively charged complexes. The introduction rate of the gallium antisite is estimated to be 1.8{plus minus}0.3 cm{sup {minus}1} in the fluence range 10{sup 17}--10{sup 18} cm{sup {minus}2} for 1.5-MeV electron irradiation at 20 K.

  18. Simulating and modeling the breakdown voltage in a semi-insulating GaAs P+N junction diode

    NASA Astrophysics Data System (ADS)

    Resfa, A.; Menezla, Brahimi. R.; Benchhima, M.

    2014-08-01

    This work aims to determine the characteristic I (breakdown voltage) of the inverse current in a GaAs PN junction diode, subject to a reverse polarization, while specifying the parameters that influence the breakdown voltage of the diode. In this work, we simulated the behavior of the ionization phenomenon by impact breakdown by avalanche of the PN junctions, subject to an inverse polarization. We will take into account both the trapping model in a stationary regime in the P+N structure using like material of basis the III-V compounds and mainly the GaAs semi-insulating in which the deep centers have in important densities. We are talking about the model of trapping in the space charge region (SCR) and that is the trap density donor and acceptor states. The carrier crossing the space charge region (SCR) of W thickness creates N electron—hole pairs: for every created pair, the electron and the hole are swept quickly by the electric field, each in an opposite direction, which comes back, according to an already accepted reasoning, to the crossing of the space charge region (SCR) by an electron or a hole. So the even N pair created by the initial particle provoke N2 ionizations and so forth. The study of the physical and electrical behaviour of semiconductors is based on the influence of the presence of deep centers on the characteristic I(V) current-tension, which requires the calculation of the electrostatic potential, the electric field, the integral of ionization, the density of the states traps, the diffusion current of minority in the regions (1) and (3), the current thermal generation in the region (2), the leakage current in the surface, and the breakdown voltage.

  19. Improved thermally stimulated current analysis in semi-insulating GaAs: New conclusions

    SciTech Connect

    Fang, Z.Q.; Look, D.C.

    1996-12-01

    Measurements of EL2{degrees} and EL2{sup +} concentrations by IR absorption and temperature-dependent photocurrent (1.13 eV) and dark current at 80K < T < 300K in semiinsulating GaAs, allow a more accurate analysis of the thermally stimulated current spectrum. We conclude that trap T{sub 2}, at 220K, is related to ASG. and controlled by both EL2{degrees} and EL2{sup +}, and T{sub 3}, at 200K is most likely a V{sub As}-related defect complex.

  20. Backgating effect in GaAs FETs with a channel—semi-insulating substrate boundary

    NASA Astrophysics Data System (ADS)

    Chaouki Megherbi, Ahmed; Benramache, Said; Guettaf, Abderrazak

    2014-03-01

    This study focuses on modeling the effects of deep hole traps, mainly the effect of the substrate (backgating effect) in a GaAs transistor MESFT. This effect is explained by the existence, at the interface, of a space charge zone. Any modulation in this area leads to response levels trapping the holes therein to the operating temperature. We subsequently developed a model treating the channel substrate interface as an N—P junction, allowing us to deduce the time dependence of the component parameters of the total resistance Rds, the pinch-off voltage VP, channel resistance, fully open Rco and the parasitic series resistance RS to bind the effect trap holes H1 and H0. When compared with the experimental results, the values of the RDS (tS) model for both traps show that there is an agreement between theory and experiment; it has inferred parameter traps, namely the density and the time constant of the trap. This means that a space charge region exists at the channel—substrate interface and that the properties can be approximated to an N—P junction.

  1. Modifications of EL2 related stable and metastable defects in semi-insulating GaAs by high energy light ion irradiation

    NASA Astrophysics Data System (ADS)

    Kabiraj, D.; Ghosh, S.

    2005-10-01

    We report the effect of high energy light ion irradiation on the defect energy levels related to the stable and metastable states of EL2 in undoped semi-insulating GaAs. GaAs samples have been irradiated at different fluences with 50 MeV Li ions. The energy of the irradiated ions is chosen in such a way that the range of the ions is more than the sample thickness. So the implantation of the irradiated ions and the formation of the extended defects at the end of the range could be avoided. The modification of the existing native point defects and the formation of new point defects under irradiation have been studied by photocurrent and thermally stimulated current spectroscopic measurements under the photoexcitation of both sub-band gap and above band gap lights.

  2. Optical evaluation of the ionized EL2 fraction in proton (24 GeV) irradiated semi-insulating GaAs

    SciTech Connect

    Ferrini, R.; Galli, M.; Guizzetti, G.; Patrini, M.; Nava, F.

    1997-11-01

    Semi-insulating SI GaAs samples from a zone refined crystal were irradiated with high energy protons (24 GeV/c, fluences up to 1.64{times}10{sup 14}p/cm{sup 2}). Optical spectra in transmittance and reflectance were accurately measured in the energy range of 0.6{endash}1.4 eV to determine, through the absorption coefficient, the concentrations of both neutral and ionized EL2 defects as a function of the proton fluence. Both these concentrations have been shown to increase linearly with the proton fluence; this behavior well explains the remarkable decrease of the charge collection efficiency observed in proton irradiated GaAs detectors at doses associated with high luminosity beams at a new particle collider accelerator (e.g., the LHC at the CERN laboratory). {copyright} {ital 1997 American Institute of Physics.}

  3. Interaction of deep levels and potential fluctuations in scattering and recombination phenomena in semi-insulating GaAs

    NASA Astrophysics Data System (ADS)

    Kažukauskas, V.; Storasta, J.; Vaitkus, J.-V.

    1996-08-01

    The complex influence of recombination centers and potential fluctuations of the band gap on the scattering and recombination phenomena in n-type semiinsulating liquid- encapsulated-Czochralski-grown GaAs were investigated by using the transient photoconductivity and photo-Hall effects. The inhomogeneities cause a hyperbolic decrease of nonequilibrium carrier concentration and the saturation of Hall mobility, while the exponential parts of the decay appear due to the recharge of deep levels. The mean recombination barrier heights of potential fluctuations were evaluated. We propose a complex ``island'' model of scattering and recombination centers, consisting of defect clusters and their associations around dislocations, surrounded by potential barriers. At low light intensities and at the temperatures below 330 K they are insulating for majority charge carriers, thus reducing an effective crystal volume and causing percolation transport effects. At the temperature higher than 330-360 K the main barrier of the island can be recharged or screened by nonequilibrium carriers and its fine barrier structure appears as an effective scatterer, causing a sharp decrease of the nonequilibrium Hall mobility. It was demonstrated that although doping with Sb reduce dislocation density, it can intensify the effect of smaller defects on transport phenomena.

  4. Growth kinetics and electronic properties of unintentionally doped semi-insulating GaN on SiC and high-resistivity GaN on sapphire grown by ammonia molecular-beam epitaxy

    NASA Astrophysics Data System (ADS)

    Tang, H.; Fang, Z. Q.; Rolfe, S.; Bardwell, J. A.; Raymond, S.

    2010-05-01

    Growth of unintentionally doped (UID) semi-insulating GaN on SiC and highly resistive GaN on sapphire using the ammonia molecular-beam epitaxy technique is reported. The semi-insulating UID GaN on SiC shows room temperature (RT) resistivity of 1011 Ω cm and well defined activation energy of 1.0 eV. The balance of compensation of unintentional donors and acceptors is such that the Fermi level is lowered to midgap, and controlled by a 1.0 eV deep level defect, which is thought to be related to the nitrogen antisite NGa, similar to the "EL2" center (arsenic antisite) in unintentionally doped semi-insulating GaAs. The highly resistive GaN on sapphire shows RT resistivity in range of 106-109 Ω cm and activation energy varying from 0.25 to 0.9 eV. In this case, the compensation of shallow donors is incomplete, and the Fermi level is controlled by levels shallower than the 1.0 eV deep centers. The growth mechanisms for the resistive UID GaN materials were investigated by experimental studies of the surface kinetics during growth. The required growth regime involves a moderate growth temperature range of 740-780 °C, and a high ammonia flux (beam equivalent pressure of 1×10-4 Torr), which ensures supersaturated coverage of surface adsorption sites with NHx radicals. Such highly nitrogen rich growth conditions lead to two-dimensional layer by layer growth and reduced oxygen incorporation.

  5. Growth kinetics and electronic properties of unintentionally doped semi-insulating GaN on SiC and high-resistivity GaN on sapphire grown by ammonia molecular-beam epitaxy

    SciTech Connect

    Tang, H.; Rolfe, S.; Bardwell, J. A.; Raymond, S.; Fang, Z. Q.

    2010-05-15

    Growth of unintentionally doped (UID) semi-insulating GaN on SiC and highly resistive GaN on sapphire using the ammonia molecular-beam epitaxy technique is reported. The semi-insulating UID GaN on SiC shows room temperature (RT) resistivity of 10{sup 11} {Omega} cm and well defined activation energy of 1.0 eV. The balance of compensation of unintentional donors and acceptors is such that the Fermi level is lowered to midgap, and controlled by a 1.0 eV deep level defect, which is thought to be related to the nitrogen antisite N{sub Ga}, similar to the ''EL2'' center (arsenic antisite) in unintentionally doped semi-insulating GaAs. The highly resistive GaN on sapphire shows RT resistivity in range of 10{sup 6}-10{sup 9} {Omega} cm and activation energy varying from 0.25 to 0.9 eV. In this case, the compensation of shallow donors is incomplete, and the Fermi level is controlled by levels shallower than the 1.0 eV deep centers. The growth mechanisms for the resistive UID GaN materials were investigated by experimental studies of the surface kinetics during growth. The required growth regime involves a moderate growth temperature range of 740-780 deg. C, and a high ammonia flux (beam equivalent pressure of 1x10{sup -4} Torr), which ensures supersaturated coverage of surface adsorption sites with NH{sub x} radicals. Such highly nitrogen rich growth conditions lead to two-dimensional layer by layer growth and reduced oxygen incorporation.

  6. High Resolution Parameter-Space from a Two-Level Model on Semi-Insulating GaAs

    NASA Astrophysics Data System (ADS)

    da Silva, S. L.; Viana, E. R.; de Oliveira, A. G.; Ribeiro, G. M.; da Silva, R. L.

    Semi-insulating Gallium Arsenide (SI-GaAs) samples experimentally show, under high electric fields and even at room temperature, negative differential conductivity in N-shaped form (NNDC). Since the most consolidated model for n-GaAs, namely, "the model", proposed by E. Schöll was not capable to generate the NNDC curve for SI-GaAs, in this work we have proposed an alternative model. The model proposed, "the two-valley model" is based on the minimal set of generation-recombination equations for two valleys inside of the conduction band, and an equation for the drift velocity as a function of the applied electric field, that covers the physical properties of the nonlinear electrical conduction of the SI-GaAs system. The "two-valley model" was capable to generate theoretically the NNDC region for the first time, and with that, we were able to build a high resolution parameter-space of the periodicity (PSP) using a Periodicity-Detection (PD) routine. In the parameter-space were observed self-organized periodic structures immersed in chaotic regions. The complex regions are presented in a "shrimp" shape rotated around a focal point, which forms in large-scale a "snail shell" shape, with intricate connections between different "shrimps". The knowledge of detailed information on parameter spaces is crucial to localize wide regions of smooth and continuous chaos.

  7. EBIC spectroscopy - A new approach to microscale characterization of deep levels in semi-insulating GaAs

    NASA Technical Reports Server (NTRS)

    Li, C.-J.; Sun, Q.; Lagowski, J.; Gatos, H. C.

    1985-01-01

    The microscale characterization of electronic defects in (SI) GaAs has been a challenging issue in connection with materials problems encountered in GaAs IC technology. The main obstacle which limits the applicability of high resolution electron beam methods such as Electron Beam-Induced Current (EBIC) and cathodoluminescence (CL) is the low concentration of free carriers in semiinsulating (SI) GaAs. The present paper provides a new photo-EBIC characterization approach which combines the spectroscopic advantages of optical methods with the high spatial resolution and scanning capability of EBIC. A scanning electron microscope modified for electronic characterization studies is shown schematically. The instrument can operate in the standard SEM mode, in the EBIC modes (including photo-EBIC and thermally stimulated EBIC /TS-EBIC/), and in the cathodo-luminescence (CL) and scanning modes. Attention is given to the use of CL, Photo-EBIC, and TS-EBIC techniques.

  8. High energy oxygen irradiation-induced defects in Fe-doped semi-insulating indium phosphide by positron annihilation technique

    NASA Astrophysics Data System (ADS)

    Pan, S.; Mandal, A.; Sohel, Md. A.; Saha, A. K.; Das, D.; Sen Gupta, A.

    2017-02-01

    Positron annihilation technique is applied to study the recovery of radiation-induced defects in 140 MeV oxygen (O6+) irradiated Fe-doped semi-insulating indium phosphide during annealing over a temperature region of 25∘C-650∘C. Lifetime spectra of the irradiated sample are fitted with three lifetime components. Trapping model analysis is used to characterize defect states corresponding to the de-convoluted lifetime values. After irradiation, the observed average lifetime of positron τavg = 263 ps at room temperature is higher than the bulk lifetime by 21 ps which reveals the presence of radiation-induced defects in the material. A decrease in τavg occurs during room temperature 25∘C to 200∘C indicating the dissociation of higher order defects, might be due to positron trapping in acceptor-type of defects (VIn). A reverse annealing stage is found at temperature range of 250∘C-425∘C for S-parameter probably due to the migration of vacancies and the formation of vacancy clusters. Increase in R-parameter from 325∘C to 425∘C indicates the change in the nature of predominant positron trapping sites. Beyond 425∘C, τavg, S-parameter and R-parameter starts decreasing and around 650∘C, τavg and S-parameter approached almost the bulk value showing the annealing out of radiation-induced defects.

  9. Semi-insulating GaAs detectors with HDPE layer for detection of fast neutrons from D-T nuclear reaction

    NASA Astrophysics Data System (ADS)

    Sagatova, Andrea; Zatko, Bohumir; Sedlackova, Katarina; Pavlovic, Marius; Necas, Vladimir; Fulop, Marko; Solar, Michael; Granja, Carlos

    2016-09-01

    Bulk semi-insulating (SI) GaAs detectors optimized for fast-neutron detection were examined using mono-energetic neutrons. The detectors have an active area of 7.36 mm2 defined by a multi-pixel structure of a AuZn Schottky contact allowing a relatively high breakdown voltage (300 V) sufficient for full depletion of the detector structure. The Schottky contact is covered by a HDPE (high density polyethylene) conversion layer, where neutrons transfer their kinetic energy to hydrogen atoms through elastic nuclear collisions. The detectors were exposed to mono-energetic neutrons generated by a deuterium (D)-tritium (T) nuclear reaction at a Van de Graaff accelerator. Neutrons reached a kinetic energy of 16.8 MeV when deuterons were accelerated by 1 MV potential. The influence of the HDPE layer thickness on the detection efficiency of the fast neutrons was studied. The thickness of the conversion layer varied from 50 μm to 1300 μm. The increase of the HDPE layer thickness led to a higher detection efficiency due to higher conversion efficiency of the HDPE layer. The effect of the active detector thickness modified by the detector reverse bias voltage on the detection efficiency was also evaluated. By increasing the detector reverse voltage, the detector active volume expands to the depth and also to the sides, slightly increasing the neutron detection efficiency.

  10. Fe-doped semi-insulating GaN with solid Fe source grown on (110) Si substrates by NH3 molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Noh, Young Kyun; Lee, Sang Tae; Kim, Moon Deock; Oh, Jae Eung

    2017-02-01

    Iron doped GaN layers were grown on (110) Si substrates by ammonia molecular beam epitaxy (MBE) using solid elemental iron as a source. Specular films with concentrations up to 1×1020 cm-3, as determined by secondary ion mass spectroscopy, were grown, unlike a limited incorporation of Fe into GaN by metal-rich rf plasma MBE. The Fe concentration in the film showed an exponential dependence on the inverse of source temperature with an activation energy of 3.4 eV, which agrees well to the reported value for the sublimation of Fe. A 1.5 μm thick GaN film with a sheet resistance of 1 GΩ/sq. was obtained by compensating unintentional residual donors with a small Fe concentration of 1×1017 cm-3. X-ray diffraction rocking curves indicated high crystalline quality, very similar to an undoped film, showing that the Fe incorporation required to obtain the semi-insulating film properties did not affect the structural properties of the film. The low-temperature PL spectra of highly resistive and semi-insulating Fe:GaN in the range of 1017 1018 cm-3 show dominant exciton emissions and enhanced donor-acceptor-pair (DAP) emissions, implying that Fe ions contribute to the DAP transition between donor levels and Fe-related acceptor levels, possibly compensating the residual donors to achieve the semi-insulating electrical properties.

  11. High-Resistivity Semi-insulating AlSb on GaAs Substrates Grown by Molecular Beam Epitaxy

    NASA Astrophysics Data System (ADS)

    Vaughan, E. I.; Addamane, S.; Shima, D. M.; Balakrishnan, G.; Hecht, A. A.

    2016-04-01

    Thin-film structures containing AlSb were grown using solid-source molecular beam epitaxy and characterized for material quality, carrier transport optimization, and room-temperature radiation detection response. Few surface defects were observed, including screw dislocations resulting from shear strain between lattice-mismatched layers. Strain was also indicated by broadening of the AlSb peak in x-ray diffraction measurements. Threading dislocations and interfacial misfit dislocations were seen with transmission electron microscopy imaging. Doping of the AlSb layer was introduced during growth using GaTe and Be to determine the effect on Hall transport properties. Hall mobility and resistivity were largest for undoped AlSb samples, at 3000 cm2/V s and 106 Ω cm, respectively, and increased doping levels progressively degraded these values. To test for radiation response, p-type/intrinsic/ n-type (PIN) diode structures were grown using undoped AlSb on n-GaAs substrates, with p-GaSb cap layers to protect the AlSb from oxidation. Alpha-particle radiation detection was achieved and spectra were produced for 241Am, 252Cf, and 239Pu sources. Reducing the detector surface area increased the pulse height observed, as expected based on voltage-capacitance relationships for diodes.

  12. Characterization of Heavily Doped ALUMINUM(X)GALLIUM(1 -X)ARSENIDE:TELLURIUM Grown on Semi-Insulating Gallium-Arsenide

    NASA Astrophysics Data System (ADS)

    Malloy, Kevin John

    The ability to dope a semiconductor into near metallic conduction widens its usefulness as a material and thereby permits the construction of new devices. Aluminum Gallium Arsenide is no exception. Heavily doped n-type Aluminum Gallium Arsenide has important device applications in tandem junction solar cells and in high electron mobility transistors. Aluminum Gallium Arsenide heavily doped with Tellurium was grown on semi-insulating Gallium Arsenide using liquid phase epitaxy. It was found that the addition of 0.4 atomic percent Tellurium to the melt reduced the Aluminum content of solid Aluminum Gallium Arsenide by up to 20 percent. A model was offered for this behavior involving a differential in the degree of association between Aluminum-Tellurium and Gallium-Tellurium in the liquid phase epitaxial melt. The electrical properties of n-type Aluminum Gallium Arsenide grown on semi-insulating Gallium Arsenide were modeled as a two sheet conductor. The two conductors consisted of the epitaxial n-type Aluminum Gallium Arsenide layer and the induced two dimensional electron gas present at the n-type Aluminum Gallium Arsenide-Gallium Arsenide heterojunction. This model showed the two dimensional electron gas as responsible for the constant low temperature carrier concentration observed experimentally. It also successfully explained the observation of a slope equal to the donor ionization potential instead of the donor ionization potential divided by two in the plot of the log of the carrier concentration versus reciprocal temperature. Because of the chemically independent nature of the deep donor ionization potential in Aluminum Gallium Arsenide, a minima interaction model was introduced to describe the donor level. The major matrix elements were determined to be V(,LX) = 4mV (+OR-) 1mV and V(,LL) = 40mV (+OR-) 10mV. These minima interaction matrix elements were an order of magnitude larger than suggested by theory, thus indicating the possible non-coulombic nature of

  13. EL2 distributions in doped and undoped liquid encapsulated Czochralski GaAs. [deep donor concentration

    NASA Technical Reports Server (NTRS)

    Holmes, D. E.; Chen, R. T.; Yang, J.

    1983-01-01

    The longitudinal and radial distributions of EL2 in undoped semi-insulating and intentionally doped n-type GaAs crystals grown by the liquid encapsulated Czochralski technique are compared. Longitudinal profiles in undoped crystals are controlled by changes in melt stoichiometry as the crystal is pulled from the melt. EL2 profiles along crystals doped above about 1 x 10 to the 17th/cu cm, on the other hand, are controlled primarily by the carrier concentration as a result of the suppression of EL2 by free electrons. Radial EL2 profiles are typically W shaped and M shaped in undoped and doped (above threshold) crystals, respectively. The origin of these radial profiles is discussed in terms of residual stress, melt stoichiometry, and the suppresion of EL2 by electrons. The results are also discussed in the light of the antisite model for EL2.

  14. Measured and computed performance of a microstrip filter composed of semi-insulating GaAs on a fused quartz substrate

    NASA Technical Reports Server (NTRS)

    Siegel, Peter H.; Dengler, Robert J.; Oswald, John E.; Sheen, David M.; Ali, Sami M.

    1991-01-01

    The performance of a microstrip hammerhead filter that has been fabricated on an electrically thin layer of semiinsulating GaAs backed by a fused quartz substrate was measured and compared to results of a three-dimensional finite-difference time-domain (FD-TD) program used to calculate the response of the filter both with and without the GaAs layer. The program, presented by Sheen et al. (1990), discretizes the entire structure and then simulates the propagation of a Gaussian pulse through the filter. The microstrip filter is intended for applications involving ultrathin lifted-off or etched-back GaAs containing both active devices and passive microstrip circuitry backed by a much thicker mechanically rigid low-loss, low-dielectric-constant substrate. The low-pass characteristics of the hammerhead filter with the intermediate GaAs layer are compared with those of the same filter on quartz alone. Both the measured and computed data show a significant shift in cutoff frequency (about 10 percent at the 3 dB points) for a GaAs layer that is 0.007 wavelengths thick at 4 GHz.

  15. Current oscillations in semi-insulating GaAs associated with field-enhanced capture of electrons by the major deep donor EL2

    NASA Technical Reports Server (NTRS)

    Kaminska, M.; Parsey, J. M.; Lagowski, J.; Gatos, H. C.

    1982-01-01

    Current oscillations thermally activated by the release of electrons from deep levels in undoped semiinsulating GaAs were observed for the first time. They were attributed to electric field-enhanced capture of electrons by the dominant deep donor EL2 (antisite AsGa defect). This enhanced capture is due to the configurational energy barrier of EL2, which is readily penetrated by hot electrons.

  16. Carbon doping of GaAs NWs

    NASA Astrophysics Data System (ADS)

    Salehzadeh Einabad, Omid

    Nanowires (NWs) have been proposed and demonstrated as the building blocks for nanoscale electronic and photonic devices such as NW field effect transistors and NW solar cells which rely on doping and trap-free carrier transport. Controlled doping of NWs and a high degree of structure and morphology control are required for device applications. However, doping of III-V nanowires such as GaAs nanowires has not been reported extensively in the literature. Carbon is a well known p-type dopant in planar GaAs due to its low diffusivity and high solubility in bulk GaAs; however its use as an intentional dopant in NW growth has not yet been investigated. In this work we studied the carbon doping of GaAs nanowires using CBr4 as the dopant source. Gold nanoparticles (NP) at the tip ofthe NWs have been used to drive the NW growth. We show that carbon doping suppresses the migration ofthe gold NPs from the tip of the NWs. In addition, we show that the carbon doping of GaAs NWs is accompanied by an increase of the axial growth rate and decrease of the lateral growth rate ofthe NWs. Carbon-doped GaAs NWs, unlike the undoped ones which are highly tapered, are rod-like. The origin of the observed morphological changes is attributed to the carbon adsorbates on the sidewalls ofthe nanowires which suppress the lateral growth of the nanowires and increase the diffusion length of the gallium adatoms on the sidewalls. Stacking fault formation consisting of alternating regIOns of zincblende and wurtzite structures has been commonly observed in NWs grown along the (111) direction. In this work, based on transmission electron microscopy (TEM) analysis, we show that carbon doping ofGaAs NWs eliminates the stacking fault formation. Raman spectroscopy was used to investigate the effects of carbon doping on the vibrational properties of the carbon-doped GaAs nanowires. Carbon doping shows a strong impact on the intrinsic longitudinal and transverse optical (La and TO) modes of the GaAs

  17. Optical characterization of semi-insulating GaAs - Determination of the Fermi energy, the concentraion of the midgap EL2 level and its occupancy

    NASA Technical Reports Server (NTRS)

    Lagowski, J.; Bugajski, M.; Matsui, M.; Gatos, H. C.

    1987-01-01

    The key electronic characteristics of semiinsulating GaAs, i.e., the Fermi energy, concentration, and occupancy of the midgap donor EL2, and the net concentration of ionized acceptors can all be determined from high-resolution measurements of the EL2 intracenter absorption. The procedure is based on the measurement of zero-phonon line intensity before and after the complete transfer of EL2 to its metastable state followed by thermal recovery. The procedure is quantitative, involves no fitting parameters, and unlike existing methods, is applicable even when a significant part of the EL2 is ionized.

  18. The influence of the scatter of heat flux at the m/c interface on the frequency of appearance of poly body and twin defects during 6″ semi-insulating GaAs crystal growth by the VGF method

    NASA Astrophysics Data System (ADS)

    Marchenko, Marina P.; Liu, Weiguo; Badawi, M. Hani; Yin, Phil

    2008-04-01

    The challenge of increasing and maintaining a high yield for 6″ GaAs crystal growth is of utmost importance for meeting the price requirements dictated by today's requirements for semi-insulating GaAs substrates. For maintaining a low dislocation density in the grown ingots, the growth process time is typically long and, sometimes, the final ingots may exhibit twins and poly-crystalline formation. These defects may occur at the beginning of the cylindrical part of the ingot, or even at the conical part of pBN crucible so the whole ingot is rejected. On the other hand, these defects may appear further away from the seed and the location of the onset of these defects will determine the extent of the useful (production worthy) crystal length, also known as "yield". The reasons for the onset of these defects are, however, not fully understood [M. Jurisch, F. Borner, Th. Bunger, St. Eichler, T. Flade, U. Kretser, A. Kohler, J. Stenzenberger, B. Weinert. J. Crystal Growth 275 (2005) 283]. In this study, we conducted numerical simulation using the transient two-dimensional mathematical model of the GaAs crystal growth by vertical gradient freeze method (VGF-method). We defined a new parameter " A" that is equal to the scatter of heat fluxes at m/c interface. Our study showed that some correlation exists between the defect appearance and A-value at m/c interface close to crucible wall. We have found that the frequency of a totally bad crystal length is higher if the A-value exceeds a certain value. Close to the crystal tail the scatter must be less than a defined A-value at the beginning of crystallization. Reduction in A-value was found to occur due to anomalies in the melt flow close to the m/c interface and crucible wall leading to the higher frequency of defects close to the crystal tail. Based on the correlation found, we developed a new technology regime that results in crystals grown with a lower frequency of defect occurrence at crucible wall.

  19. Anomalous diffusion of Ga and As from semi-insulating GaAs substrate into MOCVD grown ZnO films as a function of annealing temperature and its effect on charge compensation

    SciTech Connect

    Biswas, Pranab; Banerji, P.; Halder, Nripendra N.; Kundu, Souvik; Shripathi, T.; Gupta, M.

    2014-05-15

    The diffusion behavior of arsenic (As) and gallium (Ga) atoms from semi-insulating GaAs (SI-GaAs) into ZnO films upon post-growth annealing vis-à-vis the resulting charge compensation was investigated with the help of x-ray photoelectron spectroscopy (XPS) and secondary ion mass spectroscopy. The films, annealed at 600 ºC and 700 ºC showed p-type conductivity with a hole concentration of 1.1 × 10{sup 18} cm{sup −3} and 2.8 × 10{sup 19} cm{sup −3} respectively, whereas those annealed at 800 ºC showed n-type conductivity with a carrier concentration of 6.5 × 10{sup 16} cm{sup −3}. It is observed that at lower temperatures, large fraction of As atoms diffused from the SI-GaAs substrates into ZnO and formed acceptor related complex, (As{sub Zn}–2V{sub Zn}), by substituting Zn atoms (As{sub Zn}) and thereby creating two zinc vacancies (V{sub Zn}). Thus as-grown ZnO which was supposed to be n-type due to nonstoichiometric nature showed p-type behavior. On further increasing the annealing temperature to 800 ºC, Ga atoms diffused more than As atoms and substitute Zn atoms thereby forming shallow donor complex, Ga{sub Zn}. Electrons from donor levels then compensate the p-type carriers and the material reverts back to n-type. Thus the conversion of carrier type took place due to charge compensation between the donors and acceptors in ZnO and this compensation is the possible origin of anomalous conduction in wide band gap materials.

  20. Photoluminescence of Mn+ doped GaAs

    NASA Astrophysics Data System (ADS)

    Zhou, Huiying; Qu, Shengchun; Liao, Shuzhi; Zhang, Fasheng; Liu, Junpeng; Wang, Zhanguo

    2010-10-01

    Photoluminescence is one of the most useful techniques to obtain information about optoelectronic properties and defect structures of materials. In this work, the room-temperature and low temperature photoluminescence of Mn-doped GaAs were investigated, respectively. Mn-doped GaAs structure materials were prepared by Mn+ ion implantation at room temperature into GaAs. The implanted samples were subsequently annealed at various temperatures under N2 atmosphere to recrystallize the samples and remove implant damage. A strong peak was found for the sample annealed at 950 °C for 5 s. Transitions near 0.989 eV (1254 nm), 1.155 eV (1074 nm) and 1.329 eV (933 nm) were identified and formation of these emissions was analyzed for all prepared samples. This structure material could have myriad applications, including information storage, magnet-optical properties and energy level engineering.

  1. A simple and reliable method of thermoelectic effect spectroscopy for semi-insulating III-V semiconductors

    NASA Astrophysics Data System (ADS)

    Huang, Z. C.; Xie, K.; Wie, C. R.

    1991-08-01

    We have developed a simpler and more reliable method of thermoelectric effect spectroscopy (TEES), eliminating the second heater in the technique. We have applied this method to the deep level studies in the semi-insulating undoped or Cr-doped GaAs materials and in the GaAs epitaxial layers grown at a low temperature by molecular beam epitaxy. We have found that the electrical contacts made on front and back surfaces of the sample are more reliable for the TEES measurement than both contacts made on the same surface. In this contact arrangement, the temperature difference of about 1-2 K between the back and front surfaces is enough to produce a clear and reliable TEES data, without the need for a second heater. The results obtained by TEES are consistent with the results obtained by photoinduced transient spectroscopy (PITS) and by thermally stimulated current (TSC) measurements. The TEES results clearly distinguish between the electron traps and the hole traps. We discuss the results on the various semi-insulating GaAs samples and the advantages and limitations of the TEES technique.

  2. GaAs MESFET with lateral non-uniform doping

    NASA Technical Reports Server (NTRS)

    Wang, Y. C.; Bahrami, M.

    1983-01-01

    An analytical model of the GaAs MESFET with arbitrary non-uniform doping is presented. Numerical results for linear lateral doping profile are given as a special case. Theoretical considerations predict that better device linearity and improved F(T) can be obtained by using linear lateral doping when doping density increases from source to drain.

  3. Mixed conduction in semi-insulating gallium arsenide

    NASA Astrophysics Data System (ADS)

    Winter, J. J.; Leupold, H. A.; Ross, R. L.; Ballato, A.

    1982-12-01

    Hall effect and conductivity measurements made on semi-insulating bulk GaAs are examined by a new approach to mixed conduction analysis. Based on Fermi level and electron mobility analyses of conductivity and Hall coefficient, it uses revised values of effective densities of states at the band edges, and electron/hole mobility ratios recently adopted by other workers. The treatment provides a visual analysis of the system in terms of the electrical parameters and impurity densities, and establishes criteria for the onset of mixed conduction.

  4. Advanced BCD technology with vertical DMOS based on a semi-insulation structure

    NASA Astrophysics Data System (ADS)

    Kui, Ma; Xinghua, Fu; Jiexin, Lin; Fashun, Yang

    2016-07-01

    A new semi-insulation structure in which one isolated island is connected to the substrate was proposed. Based on this semi-insulation structure, an advanced BCD technology which can integrate a vertical device without extra internal interconnection structure was presented. The manufacturing of the new semi-insulation structure employed multi-epitaxy and selectively multi-doping. Isolated islands are insulated with the substrate by reverse-biased PN junctions. Adjacent isolated islands are insulated by isolation wall or deep dielectric trenches. The proposed semi-insulation structure and devices fixed in it were simulated through two-dimensional numerical computer simulators. Based on the new BCD technology, a smart power integrated circuit was designed and fabricated. The simulated and tested results of Vertical DMOS, MOSFETs, BJTs, resistors and diodes indicated that the proposed semi-insulation structure is reasonable and the advanced BCD technology is validated. Project supported by the National Natural Science Foundation of China (No. 61464002), the Science and Technology Fund of Guizhou Province (No. Qian Ke He J Zi [2014]2066), and the Dr. Fund of Guizhou University (No. Gui Da Ren Ji He Zi (2013)20Hao).

  5. Cooperative transition of electronic states of antisite As defects in Be-doped low-temperature-grown GaAs layers

    NASA Astrophysics Data System (ADS)

    Ambri Mohamed, Mohd; Tien Lam, Pham; Bae, K. W.; Otsuka, N.

    2011-12-01

    Magnetic properties resulting from localized spins associated with antisite arsenic ions AsGa+ in Be-doped low-temperature-grown GaAs (LT-GaAs) layers were studied by measuring the magnetization of lift-off samples. With fast cooling, the magnetization of samples at 1.8 K becomes significantly lower than that expected from Curie-type paramagnetism in the range of the applied field to 7 T, and a transition from low magnetization to the magnetization of paramagnetism occurs upon the heating of samples to 4.5 K. With slow cooling, on the other hand, samples have a paramagnetic temperature dependence throughout the measurement-temperature range. The magnetization was found to decrease monotonically when a sample was kept at a fixed low temperature. These observations are explained by the cooperative transition of electron states of AsGa defects, which is closely related to the normal-metastable state transition of EL2 defects in semi-insulating GaAs. The results of the magnetization measurements in the present study suggest that AsGa+ ions are spontaneously displaced at low temperature without photoexcitation in Be-doped LT-GaAs. The similarity of the transition observed in this system to the normal-metastable state transition of the EL2 defect was also suggested by first-principle calculations of the electron state of an AsGa defect with a doped Be atom.

  6. Studies of Nonradiative Recombination Centers in GaAs and InP*

    NASA Astrophysics Data System (ADS)

    Tuzemen, S.; Liang, Difei; Ucer, K. B.; Williams, R. T.

    2001-03-01

    The "reverse contrast" recombination center in semi-insulating GaAs, so named because of its anti-correlation with EL2 defects in spatial mapping, has been attributed to As-vacancy centers.^1 Several details of the nature of its optical transitions and of its spatial distribution are among questions open to experimental investigation. We report experiments on spectroscopy and spatial mapping of defects in semi-insulating GaAs and Fe-doped InP. *ST acknowledges the CIES for support as a Fulbright Scholar at WFU. The research at WFU is supported by NSF grant DMR-9732023. Confocal microscopy in cooperation with K. Grant and the MicroMed Facility of WFU. 1. C. Le Berre, C. Corbel, R. Mih, M. R. Brozel, S. Tüzemen, S. Kuisma, K. Saarinen, P. Hautojarvi, and R. Fornari, Appl. Phys. Lett. 66, 2354 (1995).

  7. Epitaxial Growth of Semi-Insulating GaAs

    DTIC Science & Technology

    1978-03-01

    CA 95051 Mr. R . Bell, K 101 Varlan Associates 6ll Hansen Way Palo Äl^o, CA 9^301+ \\ Mr. R . Bierl Raytheon Compa 28 Seyon Street Walthon, MA...BASI Program Code No. 7D10 78 Monitored by Office of Naval Research Arlington, Virginia 22217 Under Contract No. N 00014077 C 0542 06 - • r ...Supervisor and S. T. Jolly is the Project Scientist. D. S. Yaney and D. R . Capewell also participated in the research project. £> iii/iv 1 r

  8. Epitaxial Growth of Semi-Insulating GaAs

    DTIC Science & Technology

    1980-01-01

    83 APPENDIX - Van der Pauw Measurements of High-Resistivity Materials .... 84 vi LIST OF ILLUSTRATIONS...79 A-I. Schematic of guarded high-impedance van der Pauw system ......... 84 .i xi hL LIST OF TABLES * Table Page 1. Van der Pauw Measurement...this method has been described previously in the literature [I], we have been able to grow thicker layers than that achieved previously. Van der Pauw measurements

  9. Terahertz refractive anisotropy on femtosecond laser pulse ablated semi-insulating gallium arsenide surface

    NASA Astrophysics Data System (ADS)

    Zhao, Zhenyu; Song, Zhiqiang; Bai, Feng; Shi, Wangzhou; Zhao, Quan-Zhong

    2017-04-01

    We present an artificial variation of THz refractive index ellipse from isotropy to anisotropy at the surface of <100>-oriented semi-insulating gallium arsenide (SI-GaAs) via femtosecond pulse laser ablation. The refractive index ellipse is determined by the frequency and the polarization of incident THz radiation. The THz wave is localized in the gap of columns of micro-ripples when the polarization of THz is parallel to the micro-ripples, while no electric energy localization occurs when the polarization of THz is perpendicular to the micro-ripples. We found that the laser ablation process can induce a periodic distribution of n-type GaAs at the surface of SI-GaAs. These n-type GaAs micro-ripples work as plasmonic resonators, which are proposed to be the origin of the induced refractive index anisotropy.

  10. Optimum doping achieves high quantum yields in GaAs photoemitters

    NASA Technical Reports Server (NTRS)

    Sonnenberg, H.

    1971-01-01

    Experimental data indicate that optimum doping exists. Measured quantum yield curves indicate optimum overall response is obtained in GaAs emitters with doping in high 10 to the 18th power per cu cm range. Doping for optimum response is not necessarily in this range.

  11. Doping incorporation paths in catalyst-free Be-doped GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Casadei, Alberto; Krogstrup, Peter; Heiss, Martin; Röhr, Jason A.; Colombo, Carlo; Ruelle, Thibaud; Upadhyay, Shivendra; Sørensen, Claus B.; Nygârd, Jesper; Fontcuberta i Morral, Anna

    2013-01-01

    The incorporation paths of Be in GaAs nanowires grown by the Ga-assisted method in molecular beam epitaxy have been investigated by electrical measurements of nanowires with different doping profiles. We find that Be atoms incorporate preferentially via the nanowire side facets, while the incorporation path through the Ga droplet is negligible. We also show that Be can diffuse into the volume of the nanowire giving an alternative incorporation path. This work is an important step towards controlled doping of nanowires and will serve as a help for designing future devices based on nanowires.

  12. Doping incorporation paths in catalyst-free Be-doped GaAs nanowires

    SciTech Connect

    Casadei, Alberto; Heiss, Martin; Colombo, Carlo; Ruelle, Thibaud; Fontcuberta i Morral, Anna; Krogstrup, Peter; Roehr, Jason A.; Upadhyay, Shivendra; Sorensen, Claus B.; Nygard, Jesper

    2013-01-07

    The incorporation paths of Be in GaAs nanowires grown by the Ga-assisted method in molecular beam epitaxy have been investigated by electrical measurements of nanowires with different doping profiles. We find that Be atoms incorporate preferentially via the nanowire side facets, while the incorporation path through the Ga droplet is negligible. We also show that Be can diffuse into the volume of the nanowire giving an alternative incorporation path. This work is an important step towards controlled doping of nanowires and will serve as a help for designing future devices based on nanowires.

  13. n-Type Doping of Vapor-Liquid-Solid Grown GaAs Nanowires.

    PubMed

    Gutsche, Christoph; Lysov, Andrey; Regolin, Ingo; Blekker, Kai; Prost, Werner; Tegude, Franz-Josef

    2011-12-01

    In this letter, n-type doping of GaAs nanowires grown by metal-organic vapor phase epitaxy in the vapor-liquid-solid growth mode on (111)B GaAs substrates is reported. A low growth temperature of 400°C is adjusted in order to exclude shell growth. The impact of doping precursors on the morphology of GaAs nanowires was investigated. Tetraethyl tin as doping precursor enables heavily n-type doped GaAs nanowires in a relatively small process window while no doping effect could be found for ditertiarybutylsilane. Electrical measurements carried out on single nanowires reveal an axially non-uniform doping profile. Within a number of wires from the same run, the donor concentrations ND of GaAs nanowires are found to vary from 7 × 10(17) cm(-3) to 2 × 10(18) cm(-3). The n-type conductivity is proven by the transfer characteristics of fabricated nanowire metal-insulator-semiconductor field-effect transistor devices.

  14. Microscopic identification of native donor Ga-vacancy complexes in Te-doped GaAs

    NASA Astrophysics Data System (ADS)

    Gebauer, J.; Lausmann, M.; Staab, T. E. M.; Krause-Rehberg, R.; Hakala, M.; Puska, M. J.

    1999-07-01

    Native vacancies in Te-doped (5×1016-5×1018 cm-3) GaAs were investigated by means of positron lifetime and Doppler-broadening coincidence spectroscopy. The experimental data were related to theoretical calculations of the positron lifetime and the annihilation momentum distribution. Monovacancies were observed in all Te-doped GaAs samples under study. It will be shown that they can directly be identified to be Ga-vacancy-TeAs-donor complexes. These complexes are the dominating type of vacancy defects in the doping range under observation.

  15. Infrared absorption properties of the EL2 and the isolated As/sub Ga/ defects in neutron-transmutation-doped GaAs: Generation of an EL2-like defect

    SciTech Connect

    Manasreh, M.O.; Fischer, D.W.

    1989-02-15

    The EL2 and the isolated As/sub Ga/ antisite defects in neutron-transmutation-doped (NTD) GaAs were studied by using the infrared (ir) absorption technique concurrent with thermal annealing. The results show that irradiation with low thermal-neutron doses partially decomposes the EL2 complex in semi-insulating (si) GaAs grown by the liquid-encapsulated Czochralski (LEC) growth technique. On the other hand, a small amount of EL2 is generated in as-grown Ga-rich undoped p-type LEC GaAs. The EL2 defect in low-dose thermal-neutron-irradiated samples (both si and p-type) was found to be stable up to 850 /sup 0/C. High neutron-irradiation doses, however, completely annihilate EL2 but generate a different EL2-like defect (DL2). The DL2 defect is observed after annealing the high-dose NTD samples for 6 min at 600 /sup 0/C. The DL2 concentration is observed to be larger than that of EL2 in as-grown LEC si GaAs by a factor of 2.3 or higher. The photoquenching and thermal recovery properties of DL2 and EL2 defects are identical. However, the DL2 defect does not exhibit the same thermal stability or the zero-phonon line of the EL2 defect. Thermal annealing kinetics shows that DL2 is composed of three point defects. The residual absorption (unquenchable component) after photoquenching the EL2 (DL2) defect is interpreted as the photoionization of the isolated As/sub Ga/ antisite.

  16. Dopant mapping of Be δ-doped layers in GaAs tailored by counterdoping using scanning tunneling microscopy

    NASA Astrophysics Data System (ADS)

    Ebert, Ph.; Landrock, S.; Chiu, Y. P.; Breuer, U.; Dunin-Borkowski, R. E.

    2012-11-01

    The effect of counterdoping on the Be dopant distribution in delta (δ)-doped layers embedded in Si-doped and intrinsic GaAs is investigated by cross-sectional scanning tunneling microscopy. δ-doped layers in intrinsic GaAs exhibit a large spreading, whereas those surrounded by Si-doped GaAs remain spatially localized. The different spreading is explained by the Fermi-level pinning at the growth surface, which leads to an increased Ga vacancies concentration with increasing Si counterdoping. The Ga vacancies act as sinks for the diffusing Be dopant atoms, hence retarding the spreading.

  17. Temperature and intensity dependence of photorefractive effect in GaAs

    NASA Technical Reports Server (NTRS)

    Cheng, Li-Jen; Partovi, Afshin

    1986-01-01

    The photorefractive effect in semi-insulating Cr-doped GaAs as measured by the beam coupling technique was investigated as functions of temperature (295-386 K) and intensity (0.15-98 mW/sq cm of 1.15-micron light beams from a He-Ne laser). Results show that the photorefractive effect deteriorates rapidly over a narrow range of temperature as temperature rises, and that this characteristic temperature increases with the logarithm of beam intensity. The observed phenomenon is attributed to the competing effects of the dark- and light-induced conductivities.

  18. Determination of the charge carrier compensation mechanism in Te-doped GaAs by scanning tunneling microscopy

    NASA Astrophysics Data System (ADS)

    Gebauer, J.; Weber, E. R.; Jäger, N. D.; Urban, K.; Ebert, Ph.

    2003-03-01

    We identified the charge carrier compensation mechanism in Te-doped GaAs with atomically resolved scanning tunneling microscopy. Three types of defects were found: tellurium donors (TeAs), Ga vacancies (VGa), and Ga vacancy-donor complexes (VGa-TeAs). We show quantitatively that the compensation in Te-doped bulk GaAs is exclusively caused by vacancy-donor complexes in contrast to Si-doped GaAs. This is explained with the Fermi-level effect as the universal mechanism leading to Ga vacancy formation in n-doped GaAs, and a Coulomb interaction leading to the formation of the complexes. The quantification of the carrier compensation yields a -3e charge state of VGa in bulk GaAs.

  19. Te-doping of self-catalyzed GaAs nanowires

    SciTech Connect

    Suomalainen, S. Hakkarainen, T. V.; Salminen, T.; Koskinen, R.; Guina, Mircea; Honkanen, M.; Luna, E.

    2015-07-06

    Tellurium (Te)-doping of self-catalyzed GaAs nanowires (NWs) grown by molecular beam epitaxy is reported. The effect of Te-doping on the morphological and crystal structure of the NWs is investigated by scanning electron microscopy and high-resolution transmission electron microscopy. The study reveals that the lateral growth rate increases and axial growth rate decreases with increasing Te doping level. The changes in the NW morphology can be reverted to some extent by changing the growth temperature. At high doping levels, formation of twinning superlattice is observed alongside with the (111)-facetted sidewalls. Finally, the incorporation of Te is confirmed by Raman spectroscopy.

  20. Towards low-dimensional hole systems in Be-doped GaAs nanowires.

    PubMed

    Ullah, A R; Gluschke, J G; Krogstrup, P; Sørensen, C B; Nygård, J; Micolich, A P

    2017-03-01

    GaAs was central to the development of quantum devices but is rarely used for nanowire-based quantum devices with InAs, InSb and SiGe instead taking the leading role. p-type GaAs nanowires offer a path to studying strongly confined 0D and 1D hole systems with strong spin-orbit effects, motivating our development of nanowire transistors featuring Be-doped p-type GaAs nanowires, AuBe alloy contacts and patterned local gate electrodes towards making nanowire-based quantum hole devices. We report on nanowire transistors with traditional substrate back-gates and EBL-defined metal/oxide top-gates produced using GaAs nanowires with three different Be-doping densities and various AuBe contact processing recipes. We show that contact annealing only brings small improvements for the moderately doped devices under conditions of lower anneal temperature and short anneal time. We only obtain good transistor performance for moderate doping, with conduction freezing out at low temperature for lowly doped nanowires and inability to reach a clear off-state under gating for the highly doped nanowires. Our best devices give on-state conductivity 95 nS, off-state conductivity 2 pS, on-off ratio [Formula: see text], and sub-threshold slope 50 mV/dec at [Formula: see text] K. Lastly, we made a device featuring a moderately doped nanowire with annealed contacts and multiple top-gates. Top-gate sweeps show a plateau in the sub-threshold region that is reproducible in separate cool-downs and indicative of possible conductance quantisation highlighting the potential for future quantum device studies in this material system.

  1. Towards low-dimensional hole systems in Be-doped GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Ullah, A. R.; Gluschke, J. G.; Krogstrup, P.; Sørensen, C. B.; Nygård, J.; Micolich, A. P.

    2017-03-01

    GaAs was central to the development of quantum devices but is rarely used for nanowire-based quantum devices with InAs, InSb and SiGe instead taking the leading role. p-type GaAs nanowires offer a path to studying strongly confined 0D and 1D hole systems with strong spin–orbit effects, motivating our development of nanowire transistors featuring Be-doped p-type GaAs nanowires, AuBe alloy contacts and patterned local gate electrodes towards making nanowire-based quantum hole devices. We report on nanowire transistors with traditional substrate back-gates and EBL-defined metal/oxide top-gates produced using GaAs nanowires with three different Be-doping densities and various AuBe contact processing recipes. We show that contact annealing only brings small improvements for the moderately doped devices under conditions of lower anneal temperature and short anneal time. We only obtain good transistor performance for moderate doping, with conduction freezing out at low temperature for lowly doped nanowires and inability to reach a clear off-state under gating for the highly doped nanowires. Our best devices give on-state conductivity 95 nS, off-state conductivity 2 pS, on-off ratio ∼ {10}4, and sub-threshold slope 50 mV/dec at T=4 K. Lastly, we made a device featuring a moderately doped nanowire with annealed contacts and multiple top-gates. Top-gate sweeps show a plateau in the sub-threshold region that is reproducible in separate cool-downs and indicative of possible conductance quantisation highlighting the potential for future quantum device studies in this material system.

  2. Diode-pumped passively Q-switched Nd:GGG laser with a Bi-doped GaAs semiconductor saturable absorber

    NASA Astrophysics Data System (ADS)

    Cong, Wen; Li, Dechun; Zhao, Shengzhi; Yang, Kejian; Li, Xiangyang; Qiao, Hui; Liu, Ji

    2014-12-01

    Passive Q-switching of a diode-pumped Nd:GGG laser is demonstrated using Bi-doped GaAs as saturable absorber. The Bi-doped GaAs wafer is fabricated by ion implantation and subsequent annealing. Compared with the Q-switched laser by undoped GaAs semiconductor saturable absorber, the laser with Bi-doped GaAs as saturable absorber can produce higher output power, shorter pulses, higher single pulse energies and higher peak powers. These results suggest that Bi-doped GaAs can be a promising new candidate of semiconductor saturable absorber in Q-switched laser.

  3. Passively Q-switched and mode-locked Nd:GGG laser with a Bi-doped GaAs saturable absorber.

    PubMed

    Cong, Wen; Li, Dechun; Zhao, Shengzhi; Yang, Kejian; Li, Xiangyang; Qiao, Hui; Liu, Ji

    2014-06-16

    A simultaneously passively Q-switched and mode-locked (QML) Nd:GGG laser using a Bi-doped GaAs wafer as saturable absorber is accomplished for the first time. The Bi-doped GaAs wafer is fabricated by ion implantation and subsequent annealing. In comparison to the passively QML laser with GaAs, the QML laser with Bi-doped GaAs can generate more stable pulses with 99% modulation depth. The experiment results indicate that the Bi-doped GaAs could be an excellent saturable absorber for diode-pumped QML lasers.

  4. Increased Photoconductivity Lifetime in GaAs Nanowires by Controlled n-Type and p-Type Doping.

    PubMed

    Boland, Jessica L; Casadei, Alberto; Tütüncüoglu, Gözde; Matteini, Federico; Davies, Christopher L; Jabeen, Fauzia; Joyce, Hannah J; Herz, Laura M; Fontcuberta I Morral, Anna; Johnston, Michael B

    2016-04-26

    Controlled doping of GaAs nanowires is crucial for the development of nanowire-based electronic and optoelectronic devices. Here, we present a noncontact method based on time-resolved terahertz photoconductivity for assessing n- and p-type doping efficiency in nanowires. Using this technique, we measure extrinsic electron and hole concentrations in excess of 10(18) cm(-3) for GaAs nanowires with n-type and p-type doped shells. Furthermore, we show that controlled doping can significantly increase the photoconductivity lifetime of GaAs nanowires by over an order of magnitude: from 0.13 ns in undoped nanowires to 3.8 and 2.5 ns in n-doped and p-doped nanowires, respectively. Thus, controlled doping can be used to reduce the effects of parasitic surface recombination in optoelectronic nanowire devices, which is promising for nanowire devices, such as solar cells and nanowire lasers.

  5. Carbon doping in GaAs grown by MOVPE with trimethylgallium and triethylarsenic

    NASA Astrophysics Data System (ADS)

    Pak, Kangsa; Ashizuka, Kazuaki; Fukazawa, Hidetaka; Yamashita, Seiji; Takano, Yasushi; Yonezu, Hiroo

    1990-12-01

    Heavily carbon doped GaAs epitaxial layers were grown by low-pressure MOVPE using TMGa and TEAs as the source materials. GaAs epitaxial layers with hole concentrations up to 2.4×10 20 cm -3 were obtained. The hole concentrations of the films increased as the growth temperature (500-600°C) and/or the growth pressure (10-100 Torr) decreased, and were less dependent on V/III molar ratio (10-30). The uniform incorporation of carbon atoms during the growth was confirmed from SIMS measurements.

  6. Doping concentration dependence of the photoluminescence spectra of n-type GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Arab, Shermin; Yao, Maoqing; Zhou, Chongwu; Daniel Dapkus, P.; Cronin, Stephen B.

    2016-05-01

    In this letter, the photoluminescence spectra of n-type doped GaAs nanowires, grown by the metal organic chemical vapor deposition method, are measured at 4 K and 77 K. Our measurements indicate that an increase in carrier concentration leads to an increase in the complexity of the doping mechanism, which we attribute to the formation of different recombination centers. At high carrier concentrations, we observe a blueshift of the effective band gap energies by up to 25 meV due to the Burstein-Moss shift. Based on the full width at half maximum (FWHM) of the photoluminescence peaks, we estimate the carrier concentrations for these nanowires, which varies from 6 × 1017 cm-3 (lightly doped), to 1.5 × 1018 cm-3 (moderately doped), to 3.5 × 1018 cm-3 (heavily doped) as the partial pressure of the disilane is varied from 0.01 sccm to 1 sccm during the growth process. We find that the growth temperature variation does not affect the radiative recombination mechanism; however, it does lead to a slight enhancement in the optical emission intensities. For GaAs nanowire arrays measured at room temperature, we observe the same general dependence of band gap, FWHM, and carrier concentration on doping.

  7. Synthesis solute diffusion growth of bulk GaAs: Effects of growth temperature and stoichiometry

    NASA Astrophysics Data System (ADS)

    Markov, A. V.; Biberin, V. I.; Polyakov, A. Y.; Smirnov, N. B.; Govorkov, A. V.; Gavrin, V. N.; Kalikhov, A. V.; Kozlova, J. P.; Veretenkin, E. P.; Bowles, T. J.

    2007-07-01

    Bulk GaAs crystals were grown by synthesis solute diffusion (SSD) technique in a wide range of growth temperatures between 990 and 1150 °C. Electrical properties of these crystals were studied by means of van der Pauw, admittance spectroscopy, deep levels transient spectroscopy and photoinduced current spectroscopy techniques. It was shown that the main defects determining the properties were the GaAs antisites acceptors and the A center acceptors with the levels, respectively, Ev +0.078 eV and Ev +0.43 eV. The conductivity of the grown crystals was p-type and showed a pronounced maximum at a level of 10 4-10 5 Ω cm for growth temperatures between 1020 and 1080 °C. If the crystals were additionally compensated either by unintentional Si donors contamination from quartz crucibles or by intentional light Te doping one could get semi-insulating material with the room temperature resistivity higher than 10 6 Ω cm. The Fermi level in such crystals was pinned near Ec -0.8 eV, i.e. close to the EL2 donors. Measurements by deep levels transient spectroscopy on n-type doped crystals or by low frequency capacitance-voltage on semi-insulating crystals showed that the density of EL2 in these samples was in the low 10 14 cm -3 and that thus the EL2 donors were not the main compensating agents.

  8. Optical and Surface Characteristics of Mg-Doped GaAs Nanocrystalline Thin Film Deposited by Thermionic Vacuum Arc Technique

    NASA Astrophysics Data System (ADS)

    Pat, Suat; Özen, Soner; Şenay, Volkan; Korkmaz, Şadan

    2017-01-01

    Magnesium (Mg) is the most promising p-type dopant for gallium arsenide (GaAs) semiconductor technology. Mg-doped GaAs nanocrystalline thin film has been deposited at room temperature by the thermionic vacuum arc technique, a rapid deposition method for production of doped GaAs material. The microstructure and surface and optical properties of the deposited sample were investigated by x-ray diffraction analysis, scanning electron microscopy, energy-dispersive x-ray spectroscopy, atomic force microscopy, ultraviolet-visible spectrophotometry, and interferometry. The crystalline direction of the deposited sample was determined to be (220) plane and (331) plane at 44.53° and 72.30°, respectively. The Mg-doped GaAs nanocrystalline sample showed high transmittance.

  9. Radiation Resistance Study of Semi-Insulating GaAs-Based Radiation Detectors to Extremely High Gamma Doses

    NASA Astrophysics Data System (ADS)

    Ly Anh, T.; Perd'ochová, A.; Nečas, V.; Pavlicová, V.

    2006-01-01

    In our previous paper [V. Nečas et al.: Nucl. Inst. and Meth. A 458 (2001) 348-351] we reported on the study on radiation stability of semi-insulating (SI) LEG GaAs detectors to doses of photons from 60Co up to 19.2 kGy. Later we presented a study, which covered radiation hardness to the same doses on the base of detector material itself, where strong dependence has been proved [T. Ly Anh et al., Proceedings of the XII th International Conference on Semiconducting and Insulating Materials (SIMC-XII-2002). Smolenice Castle, Slovakia (2002) 292-295 (0-7803-7418-5)]. In this paper we present both the key electrical and detection characteristics of SI GaAs radiation detectors prepared using substrates from four various supplies and two different types of contacts, which were exposed to several gamma doses from 60Co up to the integral dose of about 1 MGy. The obtained results show that SI LEG GaAs detectors provide good spectroscopic performances and even their slight improvement after low to middle gamma irradiation doses (3 -10 kGy) was observed. Further dose exposure caused the degradation of detection properties with an extreme and following improvement depending on detector material properties. SI GaAs detector still retains its working capabilities even after very high doses applied, up to 1 MGy.

  10. Design considerations for a GaAs nipi doping superlattice solar cell

    NASA Technical Reports Server (NTRS)

    Clark, Ralph; Goradia, Chandra; Brinker, David

    1987-01-01

    A new GaAs nipi doping superlattice solar cell structure is presented, which holds promise for high efficiency coupled with very high radiation tolerance. The structure has all contacts on the unilluminated side. Design constraints are presented which this structure must satisfy in order to exhibit high efficiency and high radiation tolerance. The results of self-consistent quantum mechanical calculations are presented which show that a viable design of this cell would include relatively thick n and p layers which are fairly heavily doped.

  11. Divacancy complexes induced by Cu diffusion in Zn-doped GaAs

    NASA Astrophysics Data System (ADS)

    Elsayed, M.; Krause-Rehberg, R.; Korff, B.; Ratschinski, I.; Leipner, H. S.

    2013-08-01

    Positron annihilation spectroscopy was applied to investigate the nature and thermal behavior of defects induced by Cu diffusion in Zn-doped p-type GaAs crystals. Cu atoms were intentionally introduced in the GaAs lattice through thermally activated diffusion from a thin Cu capping layer at 1100 °C under defined arsenic vapor pressure. During isochronal annealing of the obtained Cu-diffused GaAs in the temperature range of 450-850 K, vacancy clusters were found to form, grow and finally disappear. We found that annealing at 650 K triggers the formation of divacancies, whereas further increasing in the annealing temperature up to 750 K leads to the formation of divacancy-copper complexes. The observations suggest that the formation of these vacancy-like defects in GaAs is related to the out-diffusion of Cu. Two kinds of acceptors are detected with a concentration of about 1016 - 1017 cm-3, negative ions and arsenic vacancy copper complexes. Transmission electron microscopy showed the presence of voids and Cu precipitates which are not observed by positron measurements. The positron binding energy to shallow traps is estimated using the positron trapping model. Coincidence Doppler broadening spectroscopy showed the presence of Cu in the immediate vicinity of the detected vacancies. Theoretical calculations suggested that the detected defect is VGaVAs-2CuGa.

  12. Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches

    SciTech Connect

    MAR,ALAN; LOUBRIEL,GUILLERMO M.; ZUTAVERN,FRED J.; O'MALLEY,MARTIN W.; HELGESON,WESLEY D.; BROWN,DARWIN JAMES; HJALMARSON,HAROLD P.; BACA,ALBERT G.; THORNTON,R.L.; DONALDSON,R.D.

    1999-12-17

    The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 100 million pulses. This was achieved by improving the ohmic contacts through the incorporation of a doped layer that is very effective in the suppression of filament formation, alleviating current crowding. Damage-free operation is now possible with virtually infinite expected lifetime at much higher current levels than before. The inherent damage-free current capacity of the bulk GaAs itself depends on the thickness of the doped layers and is at least 100A for a dopant diffusion depth of 4pm. The contact metal has a different damage mechanism and the threshold for damage ({approx}40A) is not further improved beyond a dopant diffusion depth of about 2{micro}m. In a diffusion-doped contact switch, the switching performance is not degraded when contact metal erosion occurs, unlike a switch with conventional contacts. This paper will compare thermal diffusion and epitaxial growth as approaches to doping the contacts. These techniques will be contrasted in terms of the fabrication issues and device characteristics.

  13. Carbon doping in molecular beam epitaxy of GaAs from a heated graphite filament

    NASA Technical Reports Server (NTRS)

    Malik, R. J.; Nottenberg, R. N.; Schubert, E. F.; Walker, J. F.; Ryan, R. W.

    1988-01-01

    Carbon doping of GaAs grown by molecular beam epitaxy has been obtained for the first time by use of a heated graphite filament. Controlled carbon acceptor concentrations over the range of 10 to the 17th-10 to the 20th/cu cm were achieved by resistively heating a graphite filament with a direct current power supply. Capacitance-voltage, p/n junction and secondary-ion mass spectrometry measurements indicate that there is negligible diffusion of carbon during growth and with postgrowth rapid thermal annealing. Carbon was used for p-type doping in the base of Npn AlGaAs/GaAs heterojunction bipolar transistors. Current gains greater than 100 and near-ideal emitter heterojunctions were obtained in transistors with a carbon base doping of 1 x 10 to the 19th/cu cm. These preliminary results indicate that carbon doping from a solid graphite source may be an attractive substitute for beryllium, which is known to have a relatively high diffusion coefficient in GaAs.

  14. Optical properties of heavily doped GaAs nanowires and electroluminescent nanowire structures.

    PubMed

    Lysov, A; Offer, M; Gutsche, C; Regolin, I; Topaloglu, S; Geller, M; Prost, W; Tegude, F-J

    2011-02-25

    We present GaAs electroluminescent nanowire structures fabricated by metal organic vapor phase epitaxy. Electroluminescent structures were realized in both axial pn-junctions in single GaAs nanowires and free-standing nanowire arrays with a pn-junction formed between nanowires and substrate, respectively. The electroluminescence emission peak from single nanowire pn-junctions at 10 K was registered at an energy of around 1.32 eV and shifted to 1.4 eV with an increasing current. The line is attributed to the recombination in the compensated region present in the nanowire due to the memory effect of the vapor-liquid-solid growth mechanism. Arrayed nanowire electroluminescent structures with a pn-junction formed between nanowires and substrate demonstrated at 5 K a strong electroluminescence peak at 1.488 eV and two shoulder peaks at 1.455 and 1.519 eV. The main emission line was attributed to the recombination in the p-doped GaAs. The other two lines correspond to the tunneling-assisted photon emission and band-edge recombination in the abrupt junction, respectively. Electroluminescence spectra are compared with the micro-photoluminescence spectra taken along the single p-, n- and single nanowire pn-junctions to find the origin of the electroluminescence peaks, the distribution of doping species and the sharpness of the junctions.

  15. Passive Q-switching with GaAs or Bi-doped GaAs saturable absorber in Tm:LuAG laser operating at 2μm wavelength.

    PubMed

    Wu, Lin; Li, Dechun; Zhao, Shengzhi; Yang, Kejian; Li, Xiangyang; Wang, Reng; Liu, Ji

    2015-06-15

    We report the first demonstration of a diode pumped passively Q-switched Tm:LuAG laser near 2μm wavelength with Bi-doped or undoped GaAs wafer as saturable absorber. For Bi-doped GaAs saturable absorber, stable Q-switched pulses with duration of 63.3ns under a repetition rate of 132.7 kHz and pulse energy of 5.51μJ are generated. In comparison to the passively Q-switched laser with undoped GaAs saturable absorber, the laser with Bi-doped GaAs can produce shorter pulses and higher peak power at almost the same incident pump power. The results suggest that Bi-doped GaAs can be an attractive candidate of saturable absorber for Q-switched laser near 2μm wavelength.

  16. Effects of gold diffusion on n-type doping of GaAs nanowires.

    PubMed

    Tambe, Michael J; Ren, Shenqiang; Gradecak, Silvija

    2010-11-10

    The deposition of n-GaAs shells is explored as a method of n-type doping in GaAs nanowires grown by the Au-mediated metal-organic chemical vapor deposition. Core-shell GaAs/n-GaAs nanowires exhibit an unintended rectifying behavior that is attributed to the Au diffusion during the shell deposition based on studies using energy dispersive X-ray spectroscopy, current-voltage, capacitance-voltage, and Kelvin probe force measurements. Removing the gold prior to n-type shell deposition results in the realization of n-type GaAs nanowires without rectification. We directly correlate the presence of gold impurities to nanowire electrical properties and provide an insight into the role of seed particles on the properties of nanowires and nanowire heterostructures.

  17. Long-lived electron spins in a modulation doped (100) GaAs quantum well

    NASA Astrophysics Data System (ADS)

    Colton, John; Meyer, David; Clark, Ken; Craft, Daniel; Tanner, Jane; Park, Tyler; White, Phil

    2013-03-01

    We have measured T1 spin lifetimes of a 14 nm modulation-doped (100) GaAs quantum well using a time-resolved pump-probe Kerr rotation technique. The quantum well was selected by tuning the wavelength of the probe laser. T1 lifetimes in excess of 1 microsecond were measured at 1.5 K and 5.5 T, exceeding the typical T2* lifetimes that have been measured in GaAs and II-VI quantum wells by orders of magnitude. We observed effects from nuclear polarization, which were largely removable by simultaneous nuclear magnetic resonance, along with two distinct lifetimes under some conditions that likely result from probing two differently-localized subsets of electrons.

  18. Long-lived electron spins in a modulation doped (100) GaAs quantum well

    NASA Astrophysics Data System (ADS)

    Colton, J. S.; Meyer, D.; Clark, K.; Craft, D.; Cutler, J.; Park, T.; White, P.

    2012-10-01

    We have measured T1 spin lifetimes of a 14 nm modulation-doped (100) GaAs quantum well using a time-resolved pump-probe Kerr rotation technique. The quantum well was selected by tuning the wavelength of the probe laser. T1 lifetimes in excess of 1 μs were measured at 1.5 K and 5.5 T, exceeding the typical T2* lifetimes that have been measured in GaAs and II-VI quantum wells by orders of magnitude. We observed effects from nuclear polarization, which were largely removable by simultaneous nuclear magnetic resonance, along with two distinct lifetimes under some conditions that likely result from probing two differently localized subsets of electrons.

  19. Photoluminescence of individual doped GaAs /AlGaAs nanofabricated quantum dots

    NASA Astrophysics Data System (ADS)

    Kalliakos, Sokratis; García, César Pascual; Pellegrini, Vittorio; Zamfirescu, Marian; Cavigli, Lucia; Gurioli, Massimo; Vinattieri, Anna; Pinczuk, Aron; Dennis, Brian S.; Pfeiffer, Loren N.; West, Ken W.

    2007-04-01

    Dilute arrays of GaAs /AlGaAs modulation-doped quantum dots with same sizes fabricated by electron beam lithography and low impact reactive ion etching exhibit highly uniform luminescence lines. Single quantum dots display spectral emission with peak energies and linewidths linked largely to the geometrical diameter of the dot and to the built-in electron population. Multicharged excitonic and biexcitonic emission intensities have activation energy of about 2meV. These results highlight the potential of high quality nanofabricated quantum dots for applications in areas that require fine control of optical emission.

  20. Laser Annealing of GaAs

    DTIC Science & Technology

    1978-12-01

    annealing implanted layers. Sheet resistance measurements made on the irradiated semi- insulating GaAs samples indicate no significant change in the... sheet resistance after laser irradiation (typical decrease in the sheet resistance after laser irradiation was found to be less than a factor of two...OF THE SHEET - RESISTANCE (P ) THE EFFECTIVE SHEET ELECTRON CONCENTRATION (N ), AND THE EFFECTIVE MOBILITY _u)FOR SEMIb- INSULATING GaAs IMPLANTED WITH

  1. Improved short-channel GaAs MESFET's by use of higher doping concentration

    NASA Astrophysics Data System (ADS)

    Daembkes, H.; Brockerhoff, W.; Heime, K.; Cappy, A.

    1984-08-01

    GaAs MESFET's with highly doped channels up to 5 x 10 to the 18th per cu cm and with both micrometer and submicrometer gates were fabricated and evaluated. FET's with 1.2 micron gates show an extrinsic transconductance of more than 250 mS/mm, cutoff frequencies around 20 GHz, and a noise figure of 2 dB at 8 GHz with 9-dB associated gain. Breakdown voltage is higher than 6 V. FET's with 1.2- and 0.4-micron gates were simultaneously fabricated on the same wafer to investigate short-channel effects. The short-channel devices show a good saturation behavior and no shift in the threshold voltage compared to the long-channel devices thus demonstrating a pronounced alleviation of short-channel effects as experienced for 1 x 10 to the 17th per cu cm doping levels. The influence of doping concentration on the performance of devices with micrometer and submicrometer gates upon doping concentration is investigated by detailed computer simulations. Good agreement between theoretical and experimental results is obtained. From these results improved technological approaches are pointed out.

  2. Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches

    SciTech Connect

    Baca, A.G.; Brown, D.J.; Donaldson, R.D.; Helgeson, W.D.; Hjalmarson, H.P.; Loubriel, G.M.; Mar, A.; O'Malley, M.W.; Thornton, R.L.; Zutavern, F.J.

    1999-08-05

    The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 50 million pulses. This was achieved by improving the ohmic contacts through the incorporation of a doped layer beneath the PCSS contacts which is very effective in the suppression of filament formation and alleviating current crowding to improve the longevity of PCSS. Virtually indefinite, damage-free operation is now possible at much higher current levels than before. The inherent damage-free current capacity of the switch depends on the thickness of the doped layers and is at least 100A for a dopant diffusion depth of 4pm. The contact metal has a different damage mechanism and the threshold for damage ({approximately}40A) is not further improved beyond a dopant diffusion depth of about 2{micro}m. In a diffusion-doped contact switch, the switching performance is not degraded when contact metal erosion occurs. This paper will compare thermal diffusion and epitaxial growth as approaches to doping the contacts. These techniques will be contrasted in terms of the fabrication issues and device characteristics.

  3. Gallium Arsenide Field Effect Transistors with Semi-Insulated Gates.

    DTIC Science & Technology

    1977-09-01

    amplifier . As a preliminary test of the theoretical anal ysis , a numbe r of conventiona l GaAs MESFETs were tested as X—band amplifiers to determine ... circuit design was actuall y based on S—parameters measured from a one—cell MESFET fabricated from the same epi taxial wafer (l6375-3011A) . This... equivalent to those of the ion implant produced SIGFETs. 2. Pulsed Operation SIGFETs and MESFETS from the same slice were operated under pulsed

  4. GaAs microcrystals selectively grown on silicon: Intrinsic carbon doping during chemical beam epitaxy with trimethylgallium

    NASA Astrophysics Data System (ADS)

    Molière, T.; Jaffré, A.; Alvarez, J.; Mencaraglia, D.; Connolly, J. P.; Vincent, L.; Hallais, G.; Mangelinck, D.; Descoins, M.; Bouchier, D.; Renard, C.

    2017-01-01

    The monolithic integration of III-V semiconductors on silicon and particularly of GaAs has aroused great interest since the 1980s. Potential applications are legion, ranging from photovoltaics to high mobility channel transistors. By using a novel integration method, we have shown that it is possible to achieve heteroepitaxial integration of GaAs crystals (typical size 1 μ m) on silicon without any structural defect such as antiphase domains, dislocations, or stress, usually reported for direct GaAs heteroepitaxy on silicon. However, concerning their electronic properties, conventional free carrier characterization methods are impractical due to the micrometric size of GaAs crystals. In order to evaluate the GaAs material quality for optoelectronic applications, a series of indirect analyses such as atom probe tomography, Raman spectroscopy, and micro-photoluminescence as a function of temperature were performed. These revealed a high content of partially electrically active carbon originating from the trimethylgallium used as the Ga precursor. Nevertheless, the very good homogeneity observed by this doping mechanism and the attractive properties of carbon as a dopant once controlled to a sufficient degree are a promising route to device doping.

  5. Electrical spin injection in modulation-doped GaAs from an in situ grown Fe/MgO layer

    SciTech Connect

    Shim, Seong Hoon; Kim, Hyung-jun; Koo, Hyun Cheol; Lee, Yun-Hi; Chang, Joonyeon

    2015-09-07

    We study spin accumulation in n-doped GaAs that were electrically injected from Fe via MgO using three-terminal Hanle measurement. The Fe/MgO/GaAs structures were prepared in a cluster molecular beam epitaxy that did not require the breaking of the vacuum. We found the crystal orientation relationship of epitaxial structures Fe[100]//MgO[110]//GaAs[110] without evident defects at the interface. Control of depletion width and interface resistance by means of modulation doping improves spin injection, leading to enhanced spin voltage (ΔV) of 6.3 mV at 10 K and 0.8 mV even at 400 K. The extracted spin lifetime and spin diffusion length of GaAs are 220 ps and 0.77 μm, respectively, at 200 K. MgO tunnel barrier grown in situ with modulation doping at the interface appears to be promising for spin injection into GaAs.

  6. Influence of stoichiometry and doping on vacancies in n-type GaAs

    NASA Astrophysics Data System (ADS)

    Gebauer, J.; Lausmann, M.; Redmann, F.; Krause-Rehberg, R.

    1999-12-01

    Native vacancies in n-type, Te-doped GaAs (n=5×1016-5×1018 cm-3) were studied by means of positron annihilation. We investigated the influence of doping, thermal treatment, and stoichiometry adjusted by changing the As pressure during annealing. Negatively charged monovacancies were found in all Te-doped samples under investigation. By using positron lifetime spectroscopy in conjunction with measurements of the annihilation momentum distribution and theoretical calculations, they can directly be identified to be VGa-TeAs complexes. After thermal treatment at 1100°C the density of the vacancies cv increases with the As pressure (pAs) like cv=0.1cdp1/4As where cd is the donor concentration. For such a treatment, cv depends only on pAs but not on the thermal history. The vacancy concentration was found to increase slightly with decreasing annealing temperature at a given pAs. This can be explained by the so-called Fermi level effect, i.e. the dependence of the equilibrium concentration of charged point defects on the position of the Fermi level.

  7. Doping-enhanced radiative efficiency enables lasing in unpassivated GaAs nanowires.

    PubMed

    Burgess, Tim; Saxena, Dhruv; Mokkapati, Sudha; Li, Zhe; Hall, Christopher R; Davis, Jeffrey A; Wang, Yuda; Smith, Leigh M; Fu, Lan; Caroff, Philippe; Tan, Hark Hoe; Jagadish, Chennupati

    2016-06-17

    Nanolasers hold promise for applications including integrated photonics, on-chip optical interconnects and optical sensing. Key to the realization of current cavity designs is the use of nanomaterials combining high gain with high radiative efficiency. Until now, efforts to enhance the performance of semiconductor nanomaterials have focused on reducing the rate of non-radiative recombination through improvements to material quality and complex passivation schemes. Here we employ controlled impurity doping to increase the rate of radiative recombination. This unique approach enables us to improve the radiative efficiency of unpassivated GaAs nanowires by a factor of several hundred times while also increasing differential gain and reducing the transparency carrier density. In this way, we demonstrate lasing from a nanomaterial that combines high radiative efficiency with a picosecond carrier lifetime ready for high speed applications.

  8. Doping-enhanced radiative efficiency enables lasing in unpassivated GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Burgess, Tim; Saxena, Dhruv; Mokkapati, Sudha; Li, Zhe; Hall, Christopher R.; Davis, Jeffrey A.; Wang, Yuda; Smith, Leigh M.; Fu, Lan; Caroff, Philippe; Tan, Hark Hoe; Jagadish, Chennupati

    2016-06-01

    Nanolasers hold promise for applications including integrated photonics, on-chip optical interconnects and optical sensing. Key to the realization of current cavity designs is the use of nanomaterials combining high gain with high radiative efficiency. Until now, efforts to enhance the performance of semiconductor nanomaterials have focused on reducing the rate of non-radiative recombination through improvements to material quality and complex passivation schemes. Here we employ controlled impurity doping to increase the rate of radiative recombination. This unique approach enables us to improve the radiative efficiency of unpassivated GaAs nanowires by a factor of several hundred times while also increasing differential gain and reducing the transparency carrier density. In this way, we demonstrate lasing from a nanomaterial that combines high radiative efficiency with a picosecond carrier lifetime ready for high speed applications.

  9. Optical absorption by free holes in heavily doped GaAs

    NASA Technical Reports Server (NTRS)

    Huberman, M. L.; Ksendzov, A.; Larsson, A.; Terhune, R.; Maserjian, J.

    1991-01-01

    Optical absorption in p-type GaAs with hole concentrations between 10 exp 19 and 10 exp 20/cu cm has been measured for wavelengths between 2 and 20 microns and compared with results of theoretical calculations. In contrast to previous measurements at lower doping levels, the occupied hole states are far from the zone center, where the heavy- and light-hole bands become parallel. This gives rise to a large joint density of states for optical transitions. It is found that the overall magnitude of the observed absorption is explained correctly by the theory, with both the free-carrier (indirect) and the inter-valence-band (direct) transitions contributing significantly to the total absorption. The strength of the absorption (a about 20,000/cm for N(A) = 5 x 10 exp 19/cu cm) is attractive for long-wavelength infrared-detector applications.

  10. Influence of photoexcitation on hopping conduction in neutron-transmutation-doped GaAs

    SciTech Connect

    Satoh, M.; Kawahara, H.; Kuriyama, K.; Kawakubo, T.; Yoneda, K.; Kimura, I.

    1988-02-15

    The nature of the tunneling-assisted hopping conduction in neutron-transmutation-doped GaAs has been studied under photoexcitation with a photon energy of 1.32 eV. It is found that the dopants activated by annealing around 400 /sup 0/C provide the electrons to the defect levels originating the hopping conduction even when under photoexcitation. The hopping conduction under photoexcitation is affected by quenching in photoconductance below 120 K concerned with the main electron trap (EL2) and/or the As antisite defect (As/sub Ga/) induced by the neutron irradiation. The photoconductance of the samples with a lower radiation damage, As/sub Ga/less than or equal to1 x 10/sup 18/ cm/sup -3/, consists of the coexistence of the hopping and band conductions.

  11. Doping-enhanced radiative efficiency enables lasing in unpassivated GaAs nanowires

    PubMed Central

    Burgess, Tim; Saxena, Dhruv; Mokkapati, Sudha; Li, Zhe; Hall, Christopher R.; Davis, Jeffrey A.; Wang, Yuda; Smith, Leigh M.; Fu, Lan; Caroff, Philippe; Tan, Hark Hoe; Jagadish, Chennupati

    2016-01-01

    Nanolasers hold promise for applications including integrated photonics, on-chip optical interconnects and optical sensing. Key to the realization of current cavity designs is the use of nanomaterials combining high gain with high radiative efficiency. Until now, efforts to enhance the performance of semiconductor nanomaterials have focused on reducing the rate of non-radiative recombination through improvements to material quality and complex passivation schemes. Here we employ controlled impurity doping to increase the rate of radiative recombination. This unique approach enables us to improve the radiative efficiency of unpassivated GaAs nanowires by a factor of several hundred times while also increasing differential gain and reducing the transparency carrier density. In this way, we demonstrate lasing from a nanomaterial that combines high radiative efficiency with a picosecond carrier lifetime ready for high speed applications. PMID:27311597

  12. Optical and surface properties of the in doped GaAs layer deposition using thermionic vacuum arc method.

    PubMed

    Pat, Suat; Özen, Soner; Şenay, Volkan; Korkmaz, Şadan; Şimşek, Veli

    2016-07-01

    A broadband optical transparent InGaAs semiconductor layer production of micron thicknesses was produced in only 75 s by thermionic vacuum arc (TVA) method at the first time. The optical and surface properties of the produced layers have been investigated. InGaAs structure is using in electronics and optoelectronics devices. The main advantage of TVA method is its fast deposition rate, without any loss in the quality of the films. Doping is a very simple and fast according to common production methods. InGaAs is an alloy of indium arsenide (InAs) and gallium arsenide (GaAs). InAs with (220) crystallographic direction and GaAs with (024)/(022) crystallographic directions were detected using by XRD analysis. GaAs and InAs are in the cubic and zinc blende crystal system, respectively. According to the transmittance spectra, sample has a broadband transparency in the range of 1000-3300 nm. According to results, defined TVA method for In doping to GaAs is proper fast and friendly method. SCANNING 38:297-302, 2016. © 2015 Wiley Periodicals, Inc.

  13. Two acceptor levels and hopping conduction in Mn-doped GaAs

    NASA Astrophysics Data System (ADS)

    Kajikawa, Yasutomo

    2017-01-01

    By analysing the experimental data of the temperature-dependent Hall-effect measurements, an additional acceptor level has been confirmed to exist in Mn-doped p-GaAs besides the isolated substitutional Mn acceptor level. It is found that, in most of the investigated samples, the room-temperature hole concentration is governed by the additional acceptor level rather than the isolated substitutional Mn acceptor level. The concentration of the additional acceptor level is found to increase almost in proportion to the square of the concentration of the isolated substitutional Mn acceptors, suggesting that the additional acceptor level is related to Mn dimers. This suggests that the ferromagnetism observed in more heavily Mn-doped GaAs may be attributed to Mn clusters. For some of the samples in which the characteristic of nearest-neighbour hopping conduction in the substitutional Mn acceptor impurity band is evident, the hopping activation energy is deduced and is proved to increase in proportion to the cube root of the concentration of the substitutional Mn acceptors.

  14. Specific features of the photoconductivity of semi-insulating cadmium telluride

    SciTech Connect

    Golubyatnikov, V. A.; Grigor’ev, F. I.; Lysenko, A. P. Strogankova, N. I.; Shadov, M. B.; Belov, A. G.

    2014-12-15

    The effect of local illumination providing a high level of free-carrier injection on the conductivity of a sample of semi-insulating cadmium telluride and on the properties of ohmic contacts to the sample is studied. It is found that, irrespective of the illumination region, the contact resistance of ohmic contacts decreases and the concentration of majority carriers in the sample grows in proportion to the illumination intensity. It is shown that inherent heterogeneities in crystals of semi-insulating semiconductors can be studied by scanning with a light probe.

  15. Crossover from negative to positive magnetoresistance in a Si delta-doped GaAs single quantum well

    NASA Astrophysics Data System (ADS)

    Lo, Shun-Tsung; Chen, Kuang Yao; Su, Yi-Chun; Liang, C.-T.; Chang, Y. H.; Kim, Gil-Ho; Wu, J.-Y.; Lin, Sheng-Di

    2010-07-01

    We have performed magnetoresistance measurements on a Si delta-doped GaAs single quantum well. With increasing temperature T, a crossover from negative magnetoresistance (NMR) to positive magnetoresistance (PMR) can be observed. Our experimental results suggest that such a crossover corresponds to a transition from variable range hopping regime to activated electron transport. This is also consistent with the measured non-monotonic carrier density dependence on T.

  16. Preparation of Large-Diameter GaAs Crystals.

    DTIC Science & Technology

    1981-09-18

    implantation as a reliable, cost-effective fabrication technology for high-performance GaAs MESFET and integrated circuits . To address these problems, the...have been prepared by in-situ synthesis and pulled from pyrolytic boron nitride (PBN) crucibles, and improved FET channels by direct ion-implantation of...viii SUMMARY Significant progress has been made toward developing large- diai.3ter, semi-insulating GaAs crystals of improved quality by LEC growth for

  17. Barrier-height measurement for a gallium arsenide metal-semi-insulator interface

    SciTech Connect

    Ayzenshtat, G. I. Lelekov, M. A.; Tolbanov, O. P.

    2007-11-15

    The I-V characteristics of structures from semi-insulating gallium arsenide with different contacts are analyzed. The Schottky barrier height was measured using two procedures; its values obtained for vanadium-based contacts amount to 0.81 {+-} 0.02 V.

  18. Observations of exciton and carrier spin relaxation in Be doped p-type GaAs

    SciTech Connect

    Asaka, Naohiro; Harasawa, Ryo; Tackeuchi, Atsushi; Lu, Shulong; Dai, Pan

    2014-03-17

    We have investigated the exciton and carrier spin relaxation in Be-doped p-type GaAs. Time-resolved spin-dependent photoluminescence (PL) measurements revealed spin relaxation behaviors between 10 and 100 K. Two PL peaks were observed at 1.511 eV (peak 1) and 1.497 eV (peak 2) at 10 K, and are attributed to the recombination of excitons bound to neutral Be acceptors (peak 1) and the band-to-acceptor transition (peak 2). The spin relaxation times of both PL peaks were measured to be 1.3–3.1 ns at 10–100 K, and found to originate from common electron spin relaxation. The observed existence of a carrier density dependence of the spin relaxation time at 10–77 K indicates that the Bir-Aronov-Pikus process is the dominant spin relaxation mechanism.

  19. Excitation and de-excitation mechanisms of Er-doped GaAs and AlGaAs

    NASA Astrophysics Data System (ADS)

    Elsaesser, David W.

    1992-12-01

    Electrical and optical characterization have been performed on GaAs and Al(x)Ga(1-x)As samples doped with Er either by ion implantation or during Molecular Beam Epitaxial (MBE) growth. Deep Level Transient Spectroscopy (DLTS) and Temperature-Dependent Hall Effect (TDH) measurements indicated the presence of two hole traps in Er-doped GaAs, at 35 and 360 meV above the valence band maximum. The former (shallower) center was thought to be due to Er substituting for a Ga atom (ErGa) and giving rise to an isoelectronic impurity potential. The second center was attributed to an Er atom occupying an interstitial position (Er(i)). Annealing studies performed on Er-implanted GaAs indicated that the ErGa center preferentially formed at higher annealing temperatures (greater than 850 C), with the Er(i) reaching a maximum concentration at an annealing temperature of around 750 C. Optical characterization performed by Photoluminescence (PL) measurements showed that the Er(i) center gave a much stronger Er-related intra-4f shell emission. Mechanisms for the excitation of the 4f shells of these two centers are discussed. Similar optically active Eri centers may be forming in AlGaAs.

  20. Growth of n-doped GaAs nanowires by Au-assisted metalorganic chemical vapor deposition: effect of flux rates of n-type dopants

    NASA Astrophysics Data System (ADS)

    Guo, Jingwei; Huang, Hui; Liu, Minjia; Ren, Xiaomin; Cai, Shiwei; Wang, Wei; Wang, Qi; Huang, Yongqing; Zhang, Xia

    2010-12-01

    N-doped GaAs nanowires (NWs) were grown on GaAs (111) B substrate by means of vapor-liquid-solid (VLS) mechanism in a metalorganic chemical vapor deposition (MOCVD) system. Two flux rates of n-type dopants used for GaAs NWs growth were researched. For comparison, undoped GaAs NWs were grown at the same conditions. It is found that all NWs are vertical to the substrate and no lateral growth occurs. The growth rate is proportional the flux rates of n dopant. It is observed that there is Gibbs-Thomson effect in doped NWs. Pure zinc blende structures without any stacking faults from bottom to top for all three samples were achieved.

  1. Enhancement of intensity-dependent absorption in InP and GaAs at 1.9 microns by doping

    NASA Technical Reports Server (NTRS)

    Li, N.-L.; Bass, M.; Swimm, R.

    1985-01-01

    It is pointed out that the study of intensity-dependent absorption (IDA) in general, and two-photon absorption (TPA), in particular, has suffered from experimental difficulties and inadequate theoretical models. Bass et al. (1979) could improve the experimental situation by making use of laser calorimetry to obtain directly the TPA coefficient of a medium with a high degree of sensitivity. In the present investigation, the employed technique has been used to study the effect of deep level dopants on IDA in InP and GaAs. It is found that the coefficient for IDA is strongly dependent on the presence of Fe in InP and Cr in GaAs. The conducted investigation had the objective to examine the effect of deep level impurities on IDA processes in InP and GaAs. Fe-doped InP and Cr-doped GaAs were compared with undoped crystals.

  2. Carbon doping for the GaAs base layer of Heterojunction Bipolar Transistors in a production scale MOVPE reactor

    NASA Astrophysics Data System (ADS)

    Brunner, F.; Bergunde, T.; Richter, E.; Kurpas, P.; Achouche, M.; Maaßdorf, A.; Würfl, J.; Weyers, M.

    2000-12-01

    In this work different approaches for carbon doping of GaAs in MOVPE are compared with respect to their growth- and device-related material properties. Doping levels up to 6×10 19 cm -3 and smooth surface morphologies are achieved with either intrinsically (TMG and AsH 3 or TMAs) or extrinsically (CBr 4) doped layers. Despite comparable structural and majority carrier properties differences in GaInP/GaAs-HBT device performance depending on base doping conditions are obtained. Devices with an intrinsically doped base layer (TMG+AsH 3) show superior transistor performance with a current gain to base sheet resistance ratio ( β/ Rsb) exceeding 0.5 for base thicknesses as large as 120 nm. The use of either CBr 4 or TMAs as base growth precursors results in reduced current gains ( β/ Rsb⩽0.3). It is shown that the achieved HBT current gain is directly related to recombination centers in the heavily doped base layer depending on doping method.

  3. Self-consistent calculations and design considerations for a GaAs nipi doping superlattice solar cell

    NASA Technical Reports Server (NTRS)

    Clark, Ralph O.; Goradia, Chandra; Brinker, David

    1987-01-01

    The authors present design constraints which show that a previously proposed GaAs nipi doping superlattice solar cell structure would not work as an efficient space solar cell. A structure based on the CLEFT process, which shows promise of being an efficient cell with very high radiation tolerance, is proposed. In order to test theoretically its viability and to optimize its design, self-consistent quantum mechanical calculations were made for a number of thicknesses of the n, i, and p layers and the dopings in the n and p layers. These results show that: 1) an i layer is not necessary; in fact, its presence makes it difficult to satisfy one of the key constraints; 2) a near-optimum design with 750-A thick n and p layers with dopings of 2.5E18/cu cm and a selective contact separation of 20 microns would yield both high efficiency and very high radiation tolerance.

  4. Surface passivation of tellurium-doped GaAs nanowires by GaP: Effect on electrical conduction

    SciTech Connect

    Darbandi, A.; Salehzadeh, O.; Watkins, S. P.; Kuyanov, P.; LaPierre, R. R.

    2014-06-21

    We report on the surface passivation of Au-assisted Te-doped GaAs nanowires (NWs) grown by metalorganic vapor phase epitaxy. The electrical properties of individual free standing NWs were assessed using a tungsten nano-probe inside a scanning electron microscope. The diameter independent apparent resistivity of both strained and relaxed passivated NWs suggests the unpinning of the Fermi level and reduction of sidewalls surface states density. Similar current-voltage properties were observed for partially axially relaxed GaAs/GaP NWs. This indicates a negligible contribution of misfit dislocations in the charge transport properties of the NWs. Low temperature micro-photoluminescence (μ-PL) measurements were also carried out for both uncapped and passivated GaAs NWs. The improvement of the integrated (μ-PL) intensity for GaAs/GaP NWs further confirms the effect of passivation.

  5. Growth of silver nanowires on GaAs wafers.

    PubMed

    Sun, Yugang

    2011-05-01

    Silver (Ag) nanowires with chemically clean surfaces have been directly grown on semi-insulating gallium arsenide (GaAs) wafers through a simple solution/solid interfacial reaction (SSIR) between the GaAs wafers themselves and aqueous solutions of silver nitrate (AgNO(3)) at room temperature. The success in synthesis of Ag nanowires mainly benefits from the low concentration of surface electrons in the semi-insulating GaAs wafers that can lead to the formation of a low-density of nuclei that facilitate their anisotropic growth into nanowires. The resulting Ag nanowires exhibit rough surfaces and reasonably good electric conductivity. These characteristics are beneficial to sensing applications based on single-nanowire surface-enhanced Raman scattering (SERS) and possible surface-adsorption-induced conductivity variation.

  6. The influence of a doping profile on the characteristics of an ion-implanted GaAs field-effect transistor with a Schottky barrier

    SciTech Connect

    Shestakov, A. K. Zhuravlev, K. S.

    2011-12-15

    A GaAs field-effect ion-implanted transistor with a Schottky barrier is simulated. The doping profile obtained when doping through an insulator mask is determined and the dependences of the static transistor characteristics on the parameters of the doping profile are calculated and analyzed. The physical processes controlling the transistor characteristics in the case of a variation in the parameters of its doping profile and the coefficient of compensation of the substrate are studied. Based on calculations, the optimal doping-profile parameters ensuring the best characteristics for transistors are predicted.

  7. Photoluminescence of Undoped, Semi-Insulating, and Mg-Implanted Indium Phosphide.

    DTIC Science & Technology

    1979-12-01

    PH/79D-8 PHOTOLUMINESCENCE OF UNDOPED, SEMI-INSULATING, AND Mg- IMPLANTED INDIUM PHOSPHIDE THESIS Presented to the Faculty of the School of Engineering...Unannealed, Unimplanted and Mg- Implanted InP:Fe at 500 K ...... 132 Appendix H: Photoluminescence of Mg- Implanted , 750* C Annealed InP:Fe at 50 K...136 Appendix I: Photoluminescence of Mg- Implanted , 7000 C Annealed InP:Fe at 4.20 K ..................... 146 Appendix J

  8. Optical power-driven electron spin relaxation regime crossover in Mn-doped bulk GaAs

    NASA Astrophysics Data System (ADS)

    Münzhuber, F.; Kiessling, T.; Ossau, W.; Molenkamp, L. W.; Astakhov, G. V.

    2015-09-01

    We demonstrate tunability of the electron spin lifetime in Mn-doped GaAs by purely optical means. The observed behavior stems from a crossover of the electron spin relaxation rate with increasing excitation density, first decreasing due to the exchange interaction of Mn bound holes with Mn ions, and then increasing again as the valence band is populated and Bir-Aranov-Pikus relaxation sets in. On this account, we explain the complex spatial spin polarization profiles emerging from inhomogeneous optical excitation, which are the result of the combined action of this nonmonotonic spin relaxation characteristics and the intricate photocarrier decay dynamics.

  9. Excitation and De-Excitation Mechanisms of Er-Doped GaAs and A1GaAs.

    DTIC Science & Technology

    1992-12-01

    laser, which operates on internal transitions in the unfilled 4f shell of the RE ion neodymium (Nd 3 +) in yttrium aluminum garnet (YAG = Y3Ah5O 1 2... operation , as well as a much smaller shift in the mode wavelength with temperature (,,hAPC) as compared to laser structures without Er-doping (,,5 APC...Techniques ......................................... 18 3.1. Hall Effect Measurements ................................... 18 3.1.1. Temperature

  10. Effect of Sb composition on the conduction type and photoluminescence of heavily Sn-doped GaAs1-xSbx

    NASA Astrophysics Data System (ADS)

    Sasaki, T.; Jinbo, Y.; Uchitomi, N.

    2006-09-01

    Heavily Sn-doped GaAs1-xSbx epitaxial films were grown on SI-GaAs (001) substrates by solid source molecular beam epitaxy. A 5 nm-thick AlSb buffer layer was employed to relax the lattice mismatch between the epilayer and the substrate. X-ray diffraction (XRD), Hall effect measurements and photoluminescence measurements were performed to characterize the epitaxial films. The heavily Sn-doped GaAs1-xSbx / AlSb films with x 0.24 indicated n-type conduction while the epitaxial films with x 0.43 indicated p-type conduction.

  11. Longevity improvement of optically activated, high gain GaAs photoconductive semiconductor switches

    SciTech Connect

    MAR,ALAN; LOUBRIEL,GUILLERMO M.; ZUTAVERN,FRED J.; O'MALLEY,MARTIN W.; HELGESON,WESLEY D.; BROWN,DARWIN JAMES; HJALMARSON,HAROLD P.; BACA,ALBERT G.

    2000-03-02

    The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 100 million pulses at 23A, and over 100 pulses at 1kA. This is achieved by improving the ohmic contacts by doping the semi-insulating GaAs underneath the metal, and by achieving a more uniform distribution of contact wear across the entire switch by distributing the trigger light to form multiple filaments. This paper will compare various approaches to doping the contacts, including ion implantation, thermal diffusion, and epitaxial growth. The device characterization also includes examination of the filament behavior using open-shutter, infra-red imaging during high gain switching. These techniques provide information on the filament carrier densities as well as the influence that the different contact structures and trigger light distributions have on the distribution of the current in the devices. This information is guiding the continuing refinement of contact structures and geometries for further improvements in switch longevity.

  12. Photoluminescence study on heavily donor and acceptor impurity doped GaAs layers grown by molecular-beam epitaxy

    SciTech Connect

    Islam, A. Z. M. Touhidul; Jung, D. W.; Noh, J. P.; Otsuka, N.

    2009-05-01

    Gallium arsenide layers doped with high concentrations of Be and Si by molecular-beam epitaxy are studied by photoluminescence (PL) spectroscopy. PL peaks from doped layers are observed at energies significantly lower than the band-gap of GaAs. The growth and doping conditions suggest that the origin of these peaks is different from that of low energy PL peaks, which were observed in earlier studies and attributed to impurity-vacancy complexes. The dependence of the peak energy on the temperature and the annealing is found to differ from that of the peaks attributed to impurity-vacancy complexes. On the basis of these observations, it is suggested that the low energy peaks are attributed to short range ordered arrangements of impurity ions. This possibility is examined by calculations of the PL spectra with models of pairs of acceptor and donor delta-doped layers and PL experiments of a superlattice of pairs of Be and Si delta-doped layers.

  13. The effect of doping on low temperature growth of high quality GaAs nanowires on polycrystalline films

    NASA Astrophysics Data System (ADS)

    DeJarld, Matt; Teran, Alan; Luengo-Kovac, Marta; Yan, Lifan; Moon, Eun Seong; Beck, Sara; Guillen, Cristina; Sih, Vanessa; Phillips, Jamie; Mirecki Milunchick, Joanna

    2016-12-01

    The increasing demand for miniature autonomous sensors requires low cost integration methods, but to date, material limitations have prevented the direct growth of optically active III-V materials on CMOS devices. We report on the deposition of GaAs nanowires on polycrystalline conductive films to allow for direct integration of optoelectronic devices on dissimilar materials. Undoped, Si-doped, and Be-doped nanowires were grown at Ts = 400 °C on oxide (indium tin oxide) and metallic (platinum and titanium) films. Be-doping is shown to significantly reduce the nanowire diameter and improve the nanowire aspect ratio to 50:1. Photoluminescence measurements of Be-doped nanowires are 1-2 orders of magnitude stronger than undoped and Si-doped nanowires and have a thermal activation energy of 14 meV, which is comparable to nanowires grown on crystalline substrates. Electrical measurements confirm that the metal-semiconductor junction is Ohmic. These results demonstrate the feasibility of integrating nanowire-based optoelectronic devices directly on CMOS chips.

  14. The effect of doping on low temperature growth of high quality GaAs nanowires on polycrystalline films.

    PubMed

    DeJarld, Matt; Teran, Alan; Luengo-Kovac, Marta; Yan, Lifan; Moon, Eun Seong; Beck, Sara; Guillen, Cristina; Sih, Vanessa; Phillips, Jamie; Milunchick, Joanna Mirecki

    2016-12-09

    The increasing demand for miniature autonomous sensors requires low cost integration methods, but to date, material limitations have prevented the direct growth of optically active III-V materials on CMOS devices. We report on the deposition of GaAs nanowires on polycrystalline conductive films to allow for direct integration of optoelectronic devices on dissimilar materials. Undoped, Si-doped, and Be-doped nanowires were grown at Ts  = 400 °C on oxide (indium tin oxide) and metallic (platinum and titanium) films. Be-doping is shown to significantly reduce the nanowire diameter and improve the nanowire aspect ratio to 50:1. Photoluminescence measurements of Be-doped nanowires are 1-2 orders of magnitude stronger than undoped and Si-doped nanowires and have a thermal activation energy of 14 meV, which is comparable to nanowires grown on crystalline substrates. Electrical measurements confirm that the metal-semiconductor junction is Ohmic. These results demonstrate the feasibility of integrating nanowire-based optoelectronic devices directly on CMOS chips.

  15. Physical property analysis of C-doped GaAs as function of the carrier concentration grown by MOCVD using elemental arsenic as precursor

    NASA Astrophysics Data System (ADS)

    Díaz-Reyes, J.; Avendaño, M. A.; Galván-Arellano, M.; Peña-Sierra, R.

    2006-03-01

    This work presents the characterization of GaAs layers grown in a metallic-arsenic-based-MOCVD system. The gallium precursor was the compound trimethylgallium (TMG) and elemental arsenic as precursor of arsenic. The most important parameters of the growth process include the substrate temperature and the composition of the carrier gas; an N2+H2 gas mixture. The influence of carbon doping on the optical and electrical properties of GaAs layers have been studied by photoluminescence (PL) spectroscopy, Photoreflectance (PR) and Hall Effect measurements. To carry out doping with carbon in the range of around 1016 to 1020 cm-3, it was necessary to modifying the hydrogen activity in the reacting atmosphere with the control of the N{2}+H{2}, mixture which was used as carrier gas. The PL response of the samples is strongly dependent on the growth temperature and showed mainly two radiative transitions, band-to-band and band-to C-acceptor. PR spectra present transitions associated to GaAs. Besides, short period oscillations near the GaAs band-gap energy are observed, interpreted as Franz-Keldysh oscillations associated to the hole-ionized acceptor (h-A-) pair modulations. For investigating the chemical bonds of impurity-related species in the GaAs layers optical absorption was measured using a FT-IR spectrometer. Device quality GaAs layers have been grown in a broad range of growth temperatures.

  16. Low temperature planar regrowth of semi-insulating InP by low pressure hydride vapour phase epitaxy for device application

    NASA Astrophysics Data System (ADS)

    Alexandre, F.; Parillaud, O.; Nguyen, D. C.; Azoulay, R.; Quillec, M.; Bouchoule, S.; Le Mestreallan, G.; Juhel, M.; Le Roux, G.; Rao, E. V. K.

    1998-05-01

    The growth of both undoped and iron doped InP on planar as well as non-planar (0 0 1)InP substrates has been explored using low pressure hydride vapour phase epitaxy (LP-HVPE) in the temperature range of 500-620°C. Secondary ion mass spectroscopy (SIMS), X-ray diffraction and photoluminescence measurements have shown no drastic degradation in the crystal quality with decreasing growth temperature. The Fe incorporation in the layers is found to be independent of the substrate temperature ( Ts) and in all experiments semi-insulating InP : Fe layers with resistivities close to 10 9 Ω cm have been obtained. A perfect growth selectivity with no deposition on masked areas and a good planarized regrowth on mesas has been demonstrated even at low Ts.

  17. Compensation Mechanism in High Purity Semi-Insulating 4H-SiC

    DTIC Science & Technology

    2007-01-01

    online 15 March 2007 A study of deep levels in high purity semi-insulating 4H-SiC has been made using temperature dependent Hall effect TDH , thermal and...optical admittance spectroscopies, and secondary ion mass spectrometry SIMS. Thermal activation energies from TDH varied from a low of 0.55 eV to a...high of 1.65 eV. All samples studied showed n-type conduction with the Fermi level in the upper half of the band gap. Fits of the TDH data to

  18. Implementation of Neural Network Method to Investigate Defect Centers in Semi-Insulating Materials

    NASA Astrophysics Data System (ADS)

    Jankowski, S.; Wierzbowski, M.; Kaminski, P.; Pawlowski, M.

    A neural network (NN) method has been proposed as a new algorithm for extraction of defect centers parameters in semi-insulating materials from experimental data obtained by photoinduced transient spectroscopy (PITS). The new algorithm is applied to investigate irradiation-induced defect centers in high resistive silicon. The folds on the PITS spectral surface formed due to the presence of defect levels are best fitted with a two-dimensional approximation function with implementation of the NN learning process. As a result, the Arrhenius plots for defect centers are obtained and the parameters of these centers are determined.

  19. GaInP/GaAs tandem solar cells with highly Te- and Mg-doped GaAs tunnel junctions grown by MBE

    NASA Astrophysics Data System (ADS)

    Zheng, Xin-He; Liu, San-Jie; Xia, Yu; Gan, Xing-Yuan; Wang, Hai-Xiao; Wang, Nai-Ming; Yang, Hui

    2015-10-01

    We report a GaInP/GaAs tandem solar cell with a novel GaAs tunnel junction (TJ) with using tellurium (Te) and magnesium (Mg) as n- and p-type dopants via dual-filament low temperature effusion cells grown by molecular beam epitaxy (MBE) at low temperature. The test Te/Mg-doped GaAs TJ shows a peak current density of 21 A/cm2. The tandem solar cell by the Te/Mg TJ shows a short-circuit current density of 12 mA/cm2, but a low open-circuit voltage range of 1.4 V˜1.71 V under AM1.5 illumination. The secondary ion mass spectroscopy (SIMS) analysis reveals that the Te doping is unexpectedly high and its doping profile extends to the Mg doping region, thus possibly resulting in a less abrupt junction with no tunneling carriers effectively. Furthermore, the tunneling interface shifts from the intended GaAs n++/p++ junction to the AlGaInP/GaAs junction with a higher bandgap AlGaInP tunneling layers, thereby reducing the tunneling peak. The Te concentration of ˜ 2.5 × 1020 in GaAs could cause a lattice strain of 10-3 in magnitude and thus a surface roughening, which also negatively influences the subsequent growth of the top subcell and the GaAs contacting layers. The doping features of Te and Mg are discussed to understand the photovoltaic response of the studied tandem cell. Project supported by the SINANO-SONY Joint Program (Grant No. Y1AAQ11001), the National Natural Science Foundation of China (Grant No. 61274134), the USCB Start-up Program (Grant No. 06105033), and the International Cooperation Projects of Suzhou City, China (Grant No. SH201215).

  20. Improvement in GaAs Device Yield and Performance through Substrate Defect Gettering

    DTIC Science & Technology

    1980-06-01

    defects will be retained at tempera- tures aproaching those normally encountered in routine device fabrication or processing procedures. Therefore, we...insulating GaAs wafers or direct ion implantation and annealing of bulk insulating substrates. The latter method would appear to be straight forward process...capsulated Czochralski (LEC) growth methods to reduce the residual donor level and, thereby, produce semi-insulating GaAs without the intentional addition

  1. Doping and electronic properties of GaAs grown by close-spaced vapor transport from powder sources for scalable III–V photovoltaics

    SciTech Connect

    Ritenour, Andrew J.; Boucher, Jason W.; DeLancey, Robert; Greenaway, Ann L.; Aloni, Shaul; Boettcher, Shannon W.

    2014-09-01

    We report the use of a simple close-spaced vapor transport technique for the growth of high-quality epitaxial GaAs films using potentially inexpensive GaAs powders as precursors. The free carrier type and density (1016 to 1019 cm–3) of the films were adjusted by addition of Te or Zn powder to the GaAs source powder. We show using photoelectrochemical and electron beam-induced current analyses that the minority carrier diffusion lengths of the n- and p-GaAs films reached ~3 μm and ~8 μm, respectively. Hall mobilities approach those achieved for GaAs grown by metal–organic chemical vapor deposition, 1000–4200 cm2 V–1 s–1 for n-GaAs and 50–240 cm V–1 s–1 for p-GaAs depending on doping level. We conclude that the electronic quality of GaAs grown by close-spaced vapor transport is similar to that of GaAs made using conventional techniques and is thus sufficient for high-performance photovoltaic applications.

  2. Doping and electronic properties of GaAs grown by close-spaced vapor transport from powder sources for scalable III–V photovoltaics

    DOE PAGES

    Ritenour, Andrew J.; Boucher, Jason W.; DeLancey, Robert; ...

    2014-09-01

    We report the use of a simple close-spaced vapor transport technique for the growth of high-quality epitaxial GaAs films using potentially inexpensive GaAs powders as precursors. The free carrier type and density (1016 to 1019 cm–3) of the films were adjusted by addition of Te or Zn powder to the GaAs source powder. We show using photoelectrochemical and electron beam-induced current analyses that the minority carrier diffusion lengths of the n- and p-GaAs films reached ~3 μm and ~8 μm, respectively. Hall mobilities approach those achieved for GaAs grown by metal–organic chemical vapor deposition, 1000–4200 cm2 V–1 s–1 for n-GaAsmore » and 50–240 cm V–1 s–1 for p-GaAs depending on doping level. We conclude that the electronic quality of GaAs grown by close-spaced vapor transport is similar to that of GaAs made using conventional techniques and is thus sufficient for high-performance photovoltaic applications.« less

  3. Persistent photoconductivity in uniforndy and selectively silicon doped AlAs / GaAs short period superlattices

    NASA Astrophysics Data System (ADS)

    Jeanjean, P.; Sicart, J.; Robert, J. L.; Mollot, F.; Planel, R.

    1991-04-01

    Hall and photo-Hall measurements have been carried out between 4 K et 400 K on MBE deposited AlAs / GaAs superiattices (SPS) with short period (25 Å < P < 50 Å) SPSs were uniformly or selectively doped with silicon. Galvanomagnetic measurements show that SPSs exhibited an electrical behaviour similar to that of AlxGal{1-x}As : Si alloy (0.32 < x < 0.35). The Hall mobility was increased under illumination and persistent photoconductivity (PPC) was observed at low temperature (DX center). Ibermal annealing of PPC was performed by increasing the measurement temperature. Two plateaus are observed in the n_H(T) curves in uniformly doped SPSs whereas only one plateau was present in selectively doped SPSs. These experimental results are interpreted in terms of the multibarrier model of the DX center recently proposed in AIxGal{1-x}As: Si. Nous présentons des résultats de mesures d'effet Hall et photo-Hall obtenus entre 4 K et 400 K dans des superréseaux AlAs / GaAs de courtes périodes (25 Å < P < 50 Å) déposées par MBE et dopées au silicium de manière uniforme ou sélectivement dans GaAs. Les mesures de concentration de porteurs et de mobilité par effet Hall à l'obscurité montrent que ce type de SPS (short period superiattice) présente un comportement électrique voisin de l'alliage AIxGal{1-x}As: Si de teneur en aluminium équivalente (0.32 < x < 0.35). Les mesures de photo-Hall à basse température montrent que ces SPS présentent également une photeconductivité persistente (PPC) et une augmentation de mobilité sous éclairement. La présence d'un plateau de PPC à basse temperature (T< 90 K) est caractéristique du centre métastable DX dans tous les cas. Des mesures de décroissance du nombre de porteurs mesurés à l'obscurité aprés éclairement quand la température augmente (capture thermique), mettent en évidence la présence de deux plateaux correspondant à deux barrières thermiques de l'état métastable du centre DX dans les SPS

  4. Factors influencing doping control and abrupt metallurgical transitions during atmospheric pressure MOVPE growth of AlGaAs and GaAs

    NASA Astrophysics Data System (ADS)

    Roberts, J. S.; Mason, N. J.; Robinson, M.

    1984-09-01

    Atmospheric pressure MOVPE of GaAs and AlGaAs has been investigated using two gas handling systems and a conventional horizontal reactor. Initially a simple source/carrier gas manifold design was assessed but severe retention of reagents in the pipework resulted in poor control of doping and interface abruptness. However, integration of the reagent and carrier gas in a pressure balanced vent/run configuration gave a significant improvement. AlGaAs/GaAs multilayers and n +/n - GaAs transitions have been used to assess the performance of both systems. Abrupt p-type doping transitions using bis-cyclopentadienylmagnesium proved unsuccessful as long doping tails were observed.

  5. Thermal annealing behavior of deep levels in Rh-doped n-type MOVPE GaAs

    NASA Astrophysics Data System (ADS)

    Naz, Nazir A.; Qurashi, Umar S.; Zafar Iqbal, M.

    2009-12-01

    We report the results of isochronal annealing study of deep levels in Rh-doped n-type GaAs grown by metal-organic vapor phase epitaxy (MOVPE). Deep level transient spectroscopy (DLTS) technique has been employed to study the effects of annealing on deep levels in Rh-doped p+nn+ junction samples. A majority-carrier emitting band of deep levels along with a high temperature peak (RhE1), corresponding to deep level energy position Ec-0.92 eV and a minority-carrier emitting band of deep levels are identified with Rh-impurity prior to thermal annealing of our samples. In addition to these Rh-related deep levels, the well-known native defect EL2 at Ec-0.79 eV is observed in majority-carrier emission spectra and two inadvertent deep-level defects, H1 at Ev+0.09 eV and H3 at Ev+0.93 eV, usually observed in reference (without Rh) samples, are also detected in the minority-carrier emission spectra of Rh-doped samples. At least one level is found to be introduced at Ec-0.13 eV in Rh-doped samples at about the same temperature position as the level E(A)1, observed in reference samples, as a result of isochronal annealing, while the other two levels observed in reference samples could not be seen in annealed Rh-doped samples. Data on the annealing behavior and other characteristics of both Rh-related bands of deep levels observed in majority- and minority-carrier emission DLTS spectra, as well as for the high temperature Rh-related electron-emission peak, are presented. Possible interpretations of these results for the nature and structure of the different deep-level defects are discussed.

  6. Comparison of OARE Accelerometer Data with Dopant Distribution in Se-Doped GaAs Crystals Grown During USML-1

    NASA Technical Reports Server (NTRS)

    Moskowitz, Milton E.; Bly, Jennifer M.; Matthiesen, David H.

    1997-01-01

    Experiments were conducted in the crystal growth furnace (CGF) during the first United States Microgravity Laboratory (USML-1), the STS-50 flight of the Space Shuttle Columbia, to determine the segregation behavior of selenium in bulk GaAs in a microgravity environment. After the flight, the selenium-doped GaAs crystals were sectioned, polished, and analyzed to determine the free carrier concentration as a function of position, One of the two crystals initially exhibited an axial concentration profile indicative of diffusion controlled growth, but this profile then changed to that predicted for a complete mixing type growth. An analytical model, proposed by Naumann [R.J. Naumann, J. Crystal Growth 142 (1994) 253], was utilized to predict the maximum allowable microgravity disturbances transverse to the growth direction during the two different translation rates used for each of the experiments. The predicted allowable acceleration levels were 4.86 microgram for the 2.5 micrometers/s furnace translation rate and 38.9 microgram for the 5.0 micrometers/s rate. These predicted values were compared to the Orbital Acceleration Research Experiment (OARE) accelerometer data recorded during the crystal growth periods for these experiments. Based on the analysis of the OARE acceleration data and utilizing the predictions from the analytical model, it is concluded that the change in segregation behavior was not caused by any acceleration events in the microgravity environment.

  7. First Principles Electronic Structure of Mn doped GaAs, GaP, and GaN Semiconductors

    SciTech Connect

    Schulthess, Thomas C; Temmerman, Walter M; Szotek, Zdzislawa; Svane, Axel; Petit, Leon

    2007-01-01

    We present first-principles electronic structure calculations of Mn doped III-V semiconductors based on the local spin-density approximation (LSDA) as well as the self-interaction corrected local spin density method (SIC-LSD). We find that it is crucial to use a self-interaction free approach to properly describe the electronic ground state. The SIC-LSD calculations predict the proper electronic ground state configuration for Mn in GaAs, GaP, and GaN. Excellent quantitative agreement with experiment is found for magnetic moment and p-d exchange in (GaMn)As. These results allow us to validate commonly used models for magnetic semiconductors. Furthermore, we discuss the delicate problem of extracting binding energies of localized levels from density functional theory calculations. We propose three approaches to take into account final state effects to estimate the binding energies of the Mn-d levels in GaAs. We find good agreement between computed values and estimates from photoemisison experiments.

  8. First-principles electronic structure of Mn-doped GaAs, GaP, and GaN semiconductors

    NASA Astrophysics Data System (ADS)

    Schulthess, T. C.; Temmerman, W. M.; Szotek, Z.; Svane, A.; Petit, L.

    2007-04-01

    We present first-principles electronic structure calculations of Mn-doped III-V semiconductors based on the local spin-density approximation (LSDA) as well as the self-interaction corrected local spin-density method (SIC-LSD). We find that it is crucial to use a self-interaction free approach to properly describe the electronic ground state. The SIC-LSD calculations predict the proper electronic ground state configuration for Mn in GaAs, GaP, and GaN. Excellent quantitative agreement with experiment is found for the magnetic moment and p-d exchange in (GaMn)As. These results allow us to validate commonly used models for magnetic semiconductors. Furthermore, we discuss the delicate problem of extracting binding energies of localized levels from density functional theory calculations. We propose three approaches to take into account final state effects to estimate the binding energies of the Mn d levels in GaAs. We find good agreement between computed values and estimates from photoemission experiments.

  9. High-field electroluminescence in semiconductor tunnel junctions with a Mn-doped GaAs layer

    SciTech Connect

    Hai, Pham Nam; Yatsui, Takashi; Ohtsu, Motoichi; Tanaka, Masaaki

    2014-09-21

    We investigated high-field electroluminescence (EL) in semiconductor tunnel junctions with a Mn-doped GaAs layer (here, referred to as GaAs:Mn). Besides the band-gap emission of GaAs, the EL spectra show visible light emissions with two peaks at 1.94 eV and 2.19 eV, which are caused by d-d transitions of the Mn atoms excited by hot electrons. The threshold voltages for band-gap and visible light EL in the tunnel junctions with a GaAs:Mn electrode are 1.3 V higher than those of GaAs:Mn excited by hot holes in reserve biased p⁺-n junctions, which is consistent with the hot carrier transport in the band profiles of these structures. Our EL results at room temperature show that the electron temperature in GaAs:Mn can be as high as ~700 K for a low input electrical power density of 0.4 W/cm², while the lattice temperature of the GaAs:Mn layer can be kept at 340 K.

  10. High-purity semi-insulating 4H-SiC for microwave device applications

    NASA Astrophysics Data System (ADS)

    Jenny, J. R.; Malta, D. P.; Müller, St G.; Powell, A. R.; Tsvetkov, V. F.; Hobgood, H. Mcd; Glass, R. C.; Carter, C. H., Jr.

    2003-05-01

    High-purity, semi-insulating (HPSI) 4H-SiC crystals with diameters up to 75 mm have been grown by the seeded sublimation technique without the intentional introduction of elemental deep-level dopants, such as vanadium. Wafers cut from these crystals exhibit homogeneous activation energies near mid gap and thermally stable semi-insulating (SI) behavior (>109 ohm-cm) throughout device processing. Secondary ion mass spectroscopy, deep-level transient spectroscopy, optical admittance spectroscopy, and electron paramagnetic resonance data suggest that the SI behavior originates from several deep levels associated with intrinsic point defects. Micropipe densities in HPSI substrates have been demonstrated to be as low as 10 cm-2 in 2-in. substrates, and the room-temperature thermal conductivity of this material is near the theoretical maximum of 5 W/cm·K for 4H-SiC. Devices fabricated on these HPSI wafers do not exhibit any substrate related back-gating effects and have power densities as high as 5.2 W/mm with 63% power added efficiency.

  11. Evaluation of modulating field of photoreflectance of surface-intrinsic-n+ type doped GaAs by using photoinduced voltage

    NASA Astrophysics Data System (ADS)

    Lee, W. Y.; Chien, J. Y.; Wang, D. P.; Huang, K. F.; Huang, T. C.

    2002-04-01

    Photoreflectance (PR) of surface-intrinsic-n+ type doped GaAs has been measured for various power densities of pump laser. The spectra exhibited many Franz-Keldysh oscillations, whereby the strength of electric field F in the undoped layer can be determined. The thus obtained Fs are subject to photovoltaic effect and are less than built-in field Fbi. In the previous work we have obtained the relation F≈Fbi-δF/2 when δF≪Fbi by using electroreflectance to simulate PR, where δF is the modulating field of the pump beam. In this work a method was devised to evaluate δF by using photoinduced voltages Vs and, hence, the relation can be verified by PR itself. The δFs obtained by Vs are also consistent with those of using imaginary part of fast Fourier transform of PR spectra.

  12. Critical metal-insulator transition due to nuclear quantum effects in Mn-doped GaAs

    NASA Astrophysics Data System (ADS)

    Bae, Soungmin; Raebiger, Hannes

    2016-12-01

    Mn-doped GaAs exhibits a critical metal-insulator transition at the Mn concentration of xcrit≈1 % . Our self-interaction corrected first principles calculation shows that for Mn concentrations x ≳1 % , hole carriers are delocalized in host valence states, and for x ≲1 % , holes tend to be trapped in impurity-band-like states. We further show that for a finite range of concentrations around xcrit the system exhibits a nonadiabatic superposition of these states, i.e., a mixing of electronic and nuclear wave functions. This means that the phase transition is continuous, and its criticality is caused by quantum effects of the atomic nuclei. In other words, the apparently electronic phase transition from the insulator to metal state cannot be described by electronic effects alone.

  13. Selfsimilar and fractal analysis of n-type delta-doped quasiregular GaAs quantum wells

    SciTech Connect

    García-Cervantes, H.; Rodríguez-Vargas, I.

    2014-05-15

    We study the electronic structure of n-type delta-doped quantum wells in GaAs in which the multiple well system is built according to the Fibonacci sequence. The building blocks A and B correspond to delta-doped wells with impurities densities n{sub 2DA} and n{sub 2DB}, and the same well width. The Thomas-Fermi approximation, the semi-empirical sp{sub 3}s* tight-binding model including spin, the Surface Green Function Matching method and the Transfer Matrix approach were implemented to obtain the confining potential, the electronic structure and the selfsimilarity of the spectrum. The fragmentation of the electronic spectra is observed whenever the building blocks A and B interact and it increases as the difference of impurities density between A and B increases as well. The wave function of the first sate of the fragmented bands presents critical characteristics, this is, it is not a localized state nor a extended one as well as it has selfsimilar features. So, the quasiregular characteristics are preserved irrespective of the complexity of the system and can affect the performance of devices based on these structures.

  14. Structural and magnetic characteristics of MnAs nanoclusters embedded in Be-doped GaAs

    NASA Astrophysics Data System (ADS)

    Rench, D. W.; Schiffer, P.; Samarth, N.

    2011-09-01

    We describe a systematic study of the synthesis, microstructure, and magnetization of hybrid ferromagnet-semiconductor nanomaterials comprised of MnAs nanoclusters embedded in a p-doped GaAs matrix. These samples are created during the in situ annealing of Be-doped (Ga,Mn)As heterostructures grown by molecular beam epitaxy. Transmission electron microscopy and magnetometry studies reveal two distinct classes of nanoclustered samples whose structural and magnetic properties depend on the Mn content of the initial (Ga,Mn)As layer. For Mn content in the range 5-7.5%, annealing creates a superparamagnetic material with a uniform distribution of small clusters (diameter ˜6 nm) and with a low blocking temperature (TB˜10 K). While transmission electron microscopy cannot definitively identify the composition and crystalline phase of these small clusters, our experimental data suggest that they may be comprised of either zinc-blende MnAs or Mn-rich regions of (Ga,Mn)As. At higher Mn content (≳8%), we find that annealing results in an inhomogeneous distribution of both small clusters as well as much larger NiAs-phase MnAs clusters (diameter ˜25 nm). These samples also exhibit supermagnetism, albeit with substantially larger magnetic moments and coercive fields, and blocking temperatures well above room temperature.

  15. Selfsimilar and fractal analysis of n-type delta-doped quasiregular GaAs quantum wells

    NASA Astrophysics Data System (ADS)

    García-Cervantes, H.; Rodríguez-Vargas, I.

    2014-05-01

    We study the electronic structure of n-type delta-doped quantum wells in GaAs in which the multiple well system is built according to the Fibonacci sequence. The building blocks A and B correspond to delta-doped wells with impurities densities n2DA and n2DB, and the same well width. The Thomas-Fermi approximation, the semi-empirical sp3s* tight-binding model including spin, the Surface Green Function Matching method and the Transfer Matrix approach were implemented to obtain the confining potential, the electronic structure and the selfsimilarity of the spectrum. The fragmentation of the electronic spectra is observed whenever the building blocks A and B interact and it increases as the difference of impurities density between A and B increases as well. The wave function of the first sate of the fragmented bands presents critical characteristics, this is, it is not a localized state nor a extended one as well as it has selfsimilar features. So, the quasiregular characteristics are preserved irrespective of the complexity of the system and can affect the performance of devices based on these structures.

  16. Mechanisms of the passage of dark currents through Cd(Zn)Te semi-insulating crystals

    NASA Astrophysics Data System (ADS)

    Sklyarchuk, V.; Fochuk, P.; Rarenko, I.; Zakharuk, Z.; Sklyarchuk, O.; Nykoniuk, Ye.; Rybka, A.; Kutny, V.; Bolotnikov, A. E.; James, R. B.

    2014-09-01

    We investigated the passage of dark currents through semi-insulating crystals of Cd(Zn)Te with weak n-type conductivity that are used widely as detectors of ionizing radiation. The crystals were grown from a tellurium solution melt at 800 оС by the zone-melting method, in which a polycrystalline rod in a quartz ampoule was moved through a zone heater at a rate of 2 mm per day. The synthesis of the rod was carried out at ~1150 оС. We determined the important electro-physical parameters of this semiconductor, using techniques based on a parallel study of the temperature dependence of current-voltage characteristics in both the ohmic and the space-charge-limited current regions. We established in these crystals the relationship between the energy levels and the concentrations of deep-level impurity states, responsible for dark conductivity and their usefulness as detectors.

  17. Simulation of Electric Field in Semi Insulating Au/CdTe/Au Detector under Flux

    SciTech Connect

    Franc, J.; James, R.; Grill, R.; Kubat, J.; Belas, E.; Hoschl, P.; Moravec, P.; Praus, P.

    2009-08-02

    We report our simulations on the profile of the electric field in semi insulating CdTe and CdZnTe with Au contacts under radiation flux. The type of the space charge and electric field distribution in the Au/CdTe/Au structure is at high fluxes result of a combined influence of charge formed due to band bending at the electrodes and from photo generated carriers, which are trapped at deep levels. Simultaneous solution of drift-diffusion and Poisson equations is used for the calculation. We show, that the space charge originating from trapped photo-carriers starts to dominate at fluxes 10{sup 15}-10{sup 16}cm{sup -2}s{sup -1}, when the influence of contacts starts to be negligible.

  18. Compensation mechanism in liquid encapsulated Czochralski GaAs Importance of melt stoichiometry

    NASA Technical Reports Server (NTRS)

    Holmes, D. E.; Chen, R. T.; Elliott, K. R.; Kirkpatrick, C. G.; Yu, P. W.

    1982-01-01

    It is shown that the key to reproducible growth of undoped semi-insulating GaAs by the liquid encapsulated Czochralski (LEC) technique is the control over the melt stoichiometry. Twelve crystals were grown from stoichiometric and nonstoichiometric melts. The material was characterized by secondary ion mass spectrometry, localized vibrational mode far infrared spectroscopy, Hall-effect measurements, optical absorption, and photoluminescence. A quantitative model for the compensation mechanism in the semi-insulating material was developed based on these measurements. The free carrier concentration is controlled by the balance between EL2 deep donors and carbon acceptors; furthermore, the incorporation of EL2 is controlled by the melt stoichiometry, increasing as the As atom fraction in the melt increases. As a result, semi-insulating material can be grown only from melts above a critical As composition. The practical significance of these results is discussed in terms of achieving high yield and reproducibility in the crystal growth process.

  19. The influence of Sb doping on the growth and electronic properties of GaAs(100) and AlGaAs(100)

    NASA Technical Reports Server (NTRS)

    Jamison, K. D.; Chen, H. C.; Bensaoula, A.; Lim, W.; Trombetta, L.

    1989-01-01

    Isoelectronic doping using antimony has been shown to reduce traps and improve material properties during epitaxial growth of Si doped GaAs(100) and AlGaAs(100). In this study, the effect of the antimony dopant on the optimal growth temperature is examined with the aim of producing high-quality heterostructures at lower temperatues. High-quality films of GaAs and AlGaAs have been grown by molecular-beam epitaxy at the normal growth temperatures of 610 and 700 C, respectively, and 50-100 C below this temperature using varying small amounts of Sb as a dopant. Electrical properties of the films were then examined using Hall mobility measurements and deep-level transient spectroscopy.

  20. Development of bulk GaAs room temperature radiation detectors

    SciTech Connect

    McGregor, D.S.; Knoll, G.F. . Dept. of Nuclear Engineering); Eisen, Y. . Soreq Nuclear Research Center); Brake, R. )

    1992-10-01

    This paper reports on GaAs, a wide band gap semiconductor with potential use as a room temperature radiation detector. Various configurations of Schottky diode detectors were fabricated with bulk crystals of liquid encapsulated Czochralski (LEC) semi-insulating undoped GaAs material. Basic detector construction utilized one Ti/Au Schottky contact and one Au/Ge/Ni alloyed ohmic contact. Pulsed X-ray analysis indicated pulse decay times dependent on bias voltage. Pulse height analysis disclosed non-uniform electric field distributions across the detectors tentatively explained as a consequence of native deep level donors (EL2) in the crystal.

  1. Thermally stimulated current spectroscopy on silicon planar-doped GaAs samples

    NASA Astrophysics Data System (ADS)

    Rubinger, R. M.; Bezerra, J. C.; Chagas, E. F.; González, J. C.; Rodrigues, W. N.; Ribeiro, G. M.; Moreira, M. V. B.; de Oliveira, A. G.

    1998-10-01

    Using thermally stimulated current (TSC) spectroscopy we have identified the presence of several deep traps in low temperature grown (LTG) nonintentionally doped bulk molecular beam epitaxy (MBE)-GaAs and silicon planar-doped MBE-GaAs samples. The experiments of TSC spectroscopy were carried out on a LTG MBE-GaAs epilayer grown at 300 °C and the planar-doped layer with a nominal silicon concentration of 3.4×1012cm-2. The LTG nonintentionally doped bulk MBE-GaAs sample shows three peaks in the TSC spectra but the planar-doped MBE-GaAs sample shows spectra similar to those of bulk samples grown by the liquid-encapsulated Czochralski and vertical gradient freeze methods. The main achievement is the experimental evidence that the potential well present in the planar-doped sample is effective in detecting the presence of different deep traps previously not seen in LTG bulk MBE-GaAs epilayers due to a shorter carrier lifetime (about 10-12 s) in the conduction band which occurs due to EL2-like deep traps recombination. This fact is evidenced by a strong hopping conduction in LTG bulk MBE-GaAs samples at temperatures lower than 300 K, but not in planar-doped MBE-GaAs samples because the two-dimensional electron gas has a higher mobility than lateral LTG bulk MBE-GaAs epilayers.

  2. Low defect densities in molecular beam epitaxial GaAs achieved by isoelectronic In doping

    NASA Technical Reports Server (NTRS)

    Bhattacharya, P. K.; Dhar, S.; Berger, P.; Juang, F.-Y.

    1986-01-01

    A study has been made of the effects of adding small amounts of In (0.2-1.2 pct) to GaAs grown by molecular beam epitaxy. The density of four electron traps decreases in concentration by an order of magnitude, and the peak intensities of prominent emissions in the excitonic spectra are reduced with increase in In content. Based on the higher surface migration rate of In, compared to Ga, at the growth temperatures it is apparent that the traps and the excitonic transitions are related to point defects. This agrees with earlier observations by Briones and Collins (1982) and Skromme et al. (1985).

  3. Femtosecond energy relaxation of nonthermal electrons injected in p-doped GaAs base of a heterojunction bipolar transistor

    NASA Astrophysics Data System (ADS)

    Prabhu, S. S.; Vengurlekar, A. S.

    2001-07-01

    We study femtosecond relaxation of minority carriers (electrons) injected into a heavily p-doped base of a heterojunction bipolar transistor (HBT). Here, we consider the case of p-doped GaAs, to be specific. The electrons are assumed to have a peaked energy distribution at t=0, with kinetic energies a few hundred meV above the conduction band threshold. We solve the time dependent Boltzmann equation governing the dynamics of these electrons. The main feature of this work is a detailed calculation of the time dependent nonthermal, nonequilibrium electron energy distribution, that relaxes due to single particle excitations via electron-hole scattering and interaction with coupled optical phonon-hole plasmon modes in the sub and picosecond time domains. We highlight the significant role that the electron-hole scattering plays in this relaxation. The majority carriers (holes) are assumed to remain in quasiequilibrium with the lattice, taken to be at room temperature (or at 77 K). We present calculations of electron energy relaxation with the hole density varied from 1×1018 to 1×1020cm-3. In the initial, subpicosecond stages of the relaxation, the energy distribution evolves into two major components: a quasiballistic but broad component, at energies near the injection energy, and an energy relaxed component near E=0. The latter becomes dominant in a picosecond or so. The electrons with an initial mean velocity of ˜1.5×108cm/s attain a cooler distribution with a mean velocity of ˜4×107 cm/s within about 1 ps for p doping in excess of 1×1019 cm-3. The temporal evolution of average velocity of the electrons should be useful in obtaining values of the base width suitable for effective operation of HBTs.

  4. Infrared absorption related to the metastable state of arsenic antisite defects in electron-irradiated GaAs

    SciTech Connect

    Kuisma, S.; Saarinen, K.; Hautojaervi, P.; Corbel, C.

    1996-12-31

    A metastable irradiation-induced vacancy is detected by positrons in semi-insulating GaAs. The vacancy is associated with the metastable state of an irradition-induced As-antisite-related defect. This metastable state absorbs IR light in contrast to the metastable state of the As-antisite-related native EL2 defect. This property can be explained by the presence of other defects complexed with the As antisite in electron-irradiated GaAs.

  5. Microscopic determination of stress distribution in GaAs grown at low temperature on GaAs (100)

    NASA Astrophysics Data System (ADS)

    Liliental-Weber, Z.; Tanaka, M.; Ishikawa, A.; Teriauchi, M.

    1991-01-01

    A microscopic strain distribution across commensurate interfaces between GaAs layers grown on semi-insulating GaAs substrates was observed by means of convergent beam electron diffraction (CBED) and large angle convergent beam methods (LACBED). Strain relaxation at a specific distance from the interface was observed in these layers without formation of misfit dislocations. It was proposed that specific point defects distributed close to the interface can explain the asymmetric broadening of high-order Laue zone (HOLZ) lines in the CBED patterns.

  6. Optical-Electrical Characteristics and Carrier Dynamics of Semi-Insulation GaAs by Terahertz Spectroscopic Technique

    NASA Astrophysics Data System (ADS)

    Han, Xiao-Wei; Hou, Lei; Yang, Lei; Wang, Zhi-Quan; Zhao, Meng-Meng; Shi, Wei

    2016-12-01

    Not Available Supported by the National Natural Science Foundation of China under Grant Nos 61575161 and 61427814, the National Basic Research Program of China under Grant No 2014CB339800, the Foundation of Shaanxi Key Science and Technology Innovation Team under Grant No 2014KTC-13, and the Special Financial Grant from the China Postdoctoral Science Foundation under Grant No 2013T60883.

  7. Highly efficient and electrically robust carbon irradiated semi-insulating GaAs based photoconductive terahertz emitters

    NASA Astrophysics Data System (ADS)

    Singh, Abhishek; Pal, Sanjoy; Surdi, Harshad; Prabhu, S. S.; Nanal, Vandana; Pillay, R. G.

    2014-02-01

    We demonstrate here an efficient photoconductive THz source with low electrical power consumption. We have increased the maximum THz radiation power emitted from SI-GaAs based photoconductive emitters (PCEs) by two orders of magnitude. By irradiating the SI-GaAs substrate with Carbon-ions up to 2 μm deep, we have created lot of defects and decreased the lifetime of photo-excited carriers inside the substrate. Depending on the irradiation dose, we find 1 to 2 orders of magnitude decrease in total current flowing in the substrate, resulting in subsequent decrease of heat dissipation in the device. This has resulted in increasing maximum cut-off of the applied voltage across PCE electrodes to operate the device without thermal breakdown from ˜35 V to >150 V for the 25 μm electrode gaps. At optimum operating conditions, carbon irradiated (1014 ions/cm2) PCEs give THz pulses with power about 100 times higher in comparison to the usual PCEs on SI-GaAs and electrical to THz power conversion efficiency has improved by a factor of ˜800.

  8. III-nitride heterostructure field-effect transistors grown on semi-insulating GaN substrate without regrowth interface charge

    NASA Astrophysics Data System (ADS)

    Liu, J. P.; Ryou, J.-H.; Yoo, D.; Zhang, Y.; Limb, J.; Horne, C. A.; Shen, S.-C.; Dupuis, R. D.; Hanser, A. D.; Preble, E. A.; Evans, K. R.

    2008-03-01

    Charge is observed at the regrowth interface for heterostructure field-effect transistors (HFETs) grown on semi-insulating (SI) bulk GaN substrates, even with Fe doping in the regrown buffer layer for reduction of the interface charge. Ultraviolet photoenhanced chemical (PEC) etching is used to treat the surface of SI bulk GaN substrates. Employing optimized etching conditions, a very smooth surface is achieved for the bulk GaN substrate after the etching. The charge at the regrowth interface is eliminated for HFETs grown on etched SI GaN substrates. Secondary ion mass spectrometry measurements show that the Si impurity concentration at the regrowth interface for HFETs grown on etched SI GaN substrates is much lower than that for HFETs grown on unetched SI GaN substrates, which suggests that the charge-containing layer on the SI substrate is removed by PEC etching and that the effects of the reduced charge layer near the regrowth interface can be eliminated by Fe doping for HFETs grown on etched SI substrates.

  9. Investigation of New SemiInsulating Behavior of III-V Compounds

    DTIC Science & Technology

    1990-02-28

    encapsulated Czochralski and horizontal Bridgman techniques and in epitaxial crystals prepared by liquid-phase electroepitaxy. By employing deep-level...com- crystals by LEG9 ") and horizontal Bridgman (HB)-" tech- plexes could be responsible for deep levels in GaAs. 1 7 niques has also been reported...Fig. 7) became direct band-gap semiconductors (GaAs and CdSe ) and was clearly visible after quenching of the absorption. explained in terms of a

  10. Ga self-diffusion in isotopically enriched GaAs heterostructures doped with Si and Zn

    SciTech Connect

    Norseng, Marshall Stephen

    1999-12-01

    This study attempts to advance the modeling of AlGaAs/GaAs/AlAs diffusion by experimental investigation of Ga self-diffusion in undoped, as-grown doped and Zinc diffused structures. We utilize novel, isotopically enriched superlattice and heterostructure samples to provide direct observation and accurate measurement of diffusion with a precision not possible using conventional techniques.

  11. Intermediate Band Performance of GaSb Type-II Quantum Dots Located in n-Doped Region of GaAs Solar Cells

    NASA Astrophysics Data System (ADS)

    Kechiantz, Ara; Afanasev, Andrei

    2013-03-01

    The intermediate band (IB) electronic states assist sub-bandgap photons in generation of additional photocurrent in single-junction solar cells. Such non-linear effect of resonant two-photon absorption of concentrated sunlight attracts much attention because it promises up to 63% conversion efficiency in IB solar cells. The main obstacle to achieving high performance is involvement of IB-states in electron-hole recombination that is drastically increasing the dark current and reducing the open circuit voltage of IB solar cells. The IB-states can be composed of quantum dots (QDs). Concentration of sunlight limits recombination through type-II QD IB-states located outside of the depletion region. In this work we model GaAs solar cell with strained GaSb type-II QDs separated from the depletion region. The focus is on type-II QDs located in n-doped region of p-n-junction. Our calculation shows that photovoltaic performance can be essentially improved by concentration of sunlight, and that this improvement is highly sensitive to the doping of materials and the shape of potential barriers surrounding type-II QDs. For instance, strained GaSb type-II QDs may increase the performance of GaAs solar cell by 20% compared to the reference GaAs solar cell without QDs.

  12. Comparison of Intersubband GaAs/AlGaAs Multiple Quantum Well Infrared Photodetectors on GaAs and GaAs-on-Si Subtrates

    NASA Technical Reports Server (NTRS)

    Sengupta, D.; Gunapala, S.; George, T.; Bandara, S.; Chang-Chien, C. N.; Leon, R.; Kayali, S.; Kuo, H.; Fang, W.; Liu, H.; Stillman, G.

    1998-01-01

    We have successfully fabricated intersubband GaAs/AlGaAs quantum well infrared photodetectors grown on GaAs-on-Si substrate and evaluated their structural, electrical, and optical characteristics. We have found that the performance is comparable to a similar detector structure grown on a semi-insulating GaAs substrate.

  13. Heat load of a P-doped GaAs photocathode in SRF electron gun

    SciTech Connect

    Wang, E.; Ben-Zvi, I.; Kewisch, J.; Burrill, A.; Rao, T.; Wu, Q.; Jain, A.; Gupta, R.; Holmes, D.

    2010-05-23

    Many efforts were made over the last decades to develop a better polarized electron source for the high energy physics. Several laboratories operate DC guns with the Gallium-Arsenide photo-cathode, which yield a highly polarized electron beam. However, the beam's emittance might well be improved using a Superconducting RF electron gun, which delivers beams of higher brightness than DC guns does, because the field gradient at the cathode is higher. SRF guns with metal cathodes and CsTe cathodes have been tested successfully. To produce polarized electrons, a Gallium-Arsenide photo-cathode must be used: an experiment to do so in a superconducting RF gun is under way at BNL. Since the cathode will be normal conducting, the problem about the heat load stemming from the cathode arises. We present our measurements of the electrical resistance of GaAs at cryogenic temperatures, a prediction of the heat load and the verification by measuring the quality factor of the gun with and without cathode.

  14. Compensation mechanism in high purity semi-insulating 4H-SiC

    NASA Astrophysics Data System (ADS)

    Mitchel, W. C.; Mitchell, William D.; Smith, H. E.; Landis, G.; Smith, S. R.; Glaser, E. R.

    2007-03-01

    A study of deep levels in high purity semi-insulating 4H-SiC has been made using temperature dependent Hall effect (TDH), thermal and optical admittance spectroscopies, and secondary ion mass spectrometry (SIMS). Thermal activation energies from TDH varied from a low of 0.55eV to a high of 1.65eV. All samples studied showed n-type conduction with the Fermi level in the upper half of the band gap. Fits of the TDH data to different charge balance equations and comparison of the fitting results with SIMS measurements indicated that the deep levels are acceptorlike even though they are in the upper half of the band gap. Carrier concentration measurements indicated that the deep levels are present in concentrations in the low 1015cm-3 range, while SIMS results demonstrate nitrogen and boron concentrations in the low to mid-1015-cm-3 range. The results suggest that compensation in this material is a complex process involving multiple deep levels.

  15. A New Radiation Hard Semiconductor — Semi-Insulating GaN: Photoelectric Properties

    NASA Astrophysics Data System (ADS)

    Vaitkus, J.; Gaubas, E.; Kazukauskas, V.; Blue, A.; Cunningham, W.; Rahman, M.; Smith, K.; Sakai, S.

    2005-06-01

    The anticipated upgrade of the CERN Large Hadron Collider to ten times brighter luminosity poses a severe challenge to semiconductor detectors in the CERN experiments. The suitability of semi-insulating GaN (SI-GaN), proposed as an alternative to silicon for the fabrication of radiation hard detectors, is investigated here in MOCVD GaN layers grown on sapphire. The electrical properties of SI-GaN were studied by dc and microwave techniques, and defect parameters determined by the method of thermally stimulated currents. Variations of charge collection efficiency (CCE) in SI-GaN diodes induced by ionizing radiation of 5.48 MeV alpha particles were revealed. Samples were also irradiated by X-rays, reactor neutrons and high-energy proton fluences of up to 1016 cm-2. The high radiation hardness of SI-GaN was demonstrated by the modest reduction in CCE, from 92% to 77%, in the material irradiated by neutrons (up to a fluence of 1015 cm-2). The CCE was unaffected by an X-rays dose of 600 MRad), but decreased to a few % after proton and neutron fluences of 1016 cm-2. The electrical characteristics vary more significantly, depending on irradiation type and dose. Fast decay components and a significant role of percolation effects are observed in the photoconductivity transients.

  16. Femtosecond energy relaxation of nonthermal electrons injected in p-doped GaAs base of a heterojunction bipolar transistor

    SciTech Connect

    Prabhu, S. S.; Vengurlekar, A. S.

    2001-07-01

    We study femtosecond relaxation of minority carriers (electrons) injected into a heavily p-doped base of a heterojunction bipolar transistor (HBT). Here, we consider the case of p-doped GaAs, to be specific. The electrons are assumed to have a peaked energy distribution at t=0, with kinetic energies a few hundred meV above the conduction band threshold. We solve the time dependent Boltzmann equation governing the dynamics of these electrons. The main feature of this work is a detailed calculation of the time dependent nonthermal, nonequilibrium electron energy distribution, that relaxes due to single particle excitations via electron{endash}hole scattering and interaction with coupled optical phonon-hole plasmon modes in the sub and picosecond time domains. We highlight the significant role that the electron-hole scattering plays in this relaxation. The majority carriers (holes) are assumed to remain in quasiequilibrium with the lattice, taken to be at room temperature (or at 77 K). We present calculations of electron energy relaxation with the hole density varied from 1{times}10{sup 18} to 1{times}10{sup 20}cm{sup {minus}3}. In the initial, subpicosecond stages of the relaxation, the energy distribution evolves into two major components: a quasiballistic but broad component, at energies near the injection energy, and an energy relaxed component near E=0. The latter becomes dominant in a picosecond or so. The electrons with an initial mean velocity of {similar_to}1.5{times}10{sup 8}cm/s attain a cooler distribution with a mean velocity of {similar_to}4{times}10{sup 7}cm/s within about 1 ps for p doping in excess of 1{times}10{sup 19}cm{sup {minus}3}. The temporal evolution of average velocity {l_angle}v{r_angle} of the electrons should be useful in obtaining values of the base width suitable for effective operation of HBTs. {copyright} 2001 American Institute of Physics.

  17. An optimal annealing technique for ohmic contacts to ion-implanted n-layers in semi-insulating indium phosphide

    NASA Astrophysics Data System (ADS)

    Pande, K. P.; Martin, E.; Gutierrez, D.; Aina, O.

    1987-03-01

    An optimal annealing process was developed for sintering AuGe ohmic contacts to ion-implanted semi-insulating InP substrates. Contacts were annealed using a standard furnace, graphite strip heater and a lamp annealer. Alloying at 375°C for 3 min was found to be most suitable for achieving good contact morphology and lowest contact resistivity. Of the three techniques, the lamp annealing technique was found to give the best results when contacts were annealed under a SiO 2 cap. Contact resistivity as low as 8 × 10 -6 cm 2 was obtained for ion-implanted n+ layers in semi-insulating InP.

  18. Growth studies of erbium-doped GaAs deposited by metalorganic vapor phase epitaxy using noval cyclopentadienyl-based erbium sources

    NASA Technical Reports Server (NTRS)

    Redwing, J. M.; Kuech, T. F.; Gordon, D. C.; Vaartstra, B. A.; Lau, S. S.

    1994-01-01

    Erbium-doped GaAS layers were grown by metalorganic vapor phase epitaxy using two new sources, bis(i-propylcyclopentadienyl)cyclopentadienyl erbium and tris(t-butylcyclopentadienyl) erbium. Controlled Er doping in the range of 10(exp 17) - 10(exp 18)/cu cm was achieved using a relatively low source temperature of 90 C. The doping exhibits a second-order dependence on inlet source partial pressure, similar to behavior obtained with cyclopentadienyl Mg dopant sources. Equivalent amounts of oxygen and Er are present in 'as-grown' films indicating that the majority of Er dopants probably exist as Er-O complexes in the material. Er(+3) luminescence at 1.54 micrometers was measured from the as-grown films, but ion implantation of additional oxygen decreases the emission intensity. Electrical compensation of n-type GaAs layers codoped with Er and Si is directly correlated to the Er concentration is proposed to arise from the deep centers associated with Er which are responsible for a broad emission band near 0.90 micrometers present in the photoluminescence spectra of GaAs:Si, Er films.

  19. Investigation of the optical properties of GaAs with δ-Si doping grown by molecular-beam epitaxy at low temperatures

    SciTech Connect

    Lavrukhin, D. V. Yachmenev, A. E.; Bugaev, A. S.; Galiev, G. B.; Klimov, E. A.; Khabibullin, R. A.; Ponomarev, D. S.; Maltsev, P. P.

    2015-07-15

    Molecular-beam epitaxy is used for the preparation of structures based on “low-temperature” grown GaAs with introduced d-Si doping. Specific features in the photon-energy range of 1.28–1.48 eV are observed in the photoluminescence spectrum after structures annealing at temperatures of 520 and 580°C; these features are related to the formation of point defects and their complexes. The “pump–probe” light transmission measurements reveal that the characteristic lifetimes of nonequilibrium carriers in the fabricated structures amount to T{sup c} ≈ 1.2–1.5 ps.

  20. Magnesium doping of efficient GaAs and Ga(0.75)In(0.25)As solar cells grown by metalorganic chemical vapor deposition

    NASA Technical Reports Server (NTRS)

    Lewis, C. R.; Ford, C. W.; Werthen, J. G.

    1984-01-01

    Magnesium has been substituted for zinc in GaAs and Ga(0.75)In(0.25)As solar cells grown by metalorganic chemical vapor deposition (MOCVD). Bis(cyclopentadienyl)magnesium (Cp2Mg) is used as the MOCVD transport agent for Mg. Full retention of excellent material quality and efficient cell performance results. The substitution of Mg for Zn would enhance the abruptness and reproducibility of doping profiles, and facilitate high temperature processing and operation, due to the much lower diffusion coefficient of Mg, relative to Zn, in these materials.

  1. Carrier and defect dynamics in photoexcited semi-insulating epitaxial GaN layers

    NASA Astrophysics Data System (ADS)

    Gaubas, E.; Juršėnas, S.; Miasojedovas, S.; Vaitkus, J.; Žukauskas, A.

    2004-10-01

    Transients of fast free-carrier recombination and of multitrapping processes, determined by different types of defects, have been traced by photoluminescence (PL) and contact photoconductivity (CPC) in semi-insulating GaN epitaxial layers. To eliminate effects caused by the electrodes, the CPC decays were supplemented with noninvasive microwave absorption transients. The lifetimes of fast recombination and initial free-carrier capture processes were evaluated using ultraviolet (UV) time-resolved photoluminescence transients. The UV PL band peaked at 3.42 eV with contributions from both stimulated and spontaneous emission was attributed to band-to-band recombination. At the highest excitations, the initial PL decay time exhibited a value of 880 ps due to nonradiative free-carrier recombination. The radiative centers were revealed in continuous-wave PL spectra, where the UV band was accompanied with the bands of blue (B) PL, peaked in the range of 2.82-3.10 eV, and yellow (Y) PL, peaked at 2.19 eV, ascribed to dislocations and bulk donor-acceptor recombination, respectively. The time scale of the relaxation rate exhibited a crossover from picoseconds for stimulated emission to hundreds of nanoseconds for multitrapping. In the asymptotic part, a stretched-exponent decay on the millisecond scale was observed with the disorder factor of α =0.7. The asymptotic decay is explained by competition of centers of nonradiative recombination within bulk of the material and trapping attributed to the dislocations. Behavior of the dislocation-attributed capture centers was simulated using a model of capture cross section, which depends on the excess carrier concentration via screening.

  2. Characterization of epitaxial GaAs MOS capacitors using atomic layer-deposited TiO2/Al2O3 gate stack: study of Ge auto-doping and p-type Zn doping

    PubMed Central

    2012-01-01

    Electrical and physical properties of a metal-oxide-semiconductor [MOS] structure using atomic layer-deposited high-k dielectrics (TiO2/Al2O3) and epitaxial GaAs [epi-GaAs] grown on Ge(100) substrates have been investigated. The epi-GaAs, either undoped or Zn-doped, was grown using metal-organic chemical vapor deposition method at 620°C to 650°C. The diffusion of Ge atoms into epi-GaAs resulted in auto-doping, and therefore, an n-MOS behavior was observed for undoped and Zn-doped epi-GaAs with the doping concentration up to approximately 1017 cm-3. This is attributed to the diffusion of a significant amount of Ge atoms from the Ge substrate as confirmed by the simulation using SILVACO software and also from the secondary ion mass spectrometry analyses. The Zn-doped epi-GaAs with a doping concentration of approximately 1018 cm-3 converts the epi-GaAs layer into p-type since the Zn doping is relatively higher than the out-diffused Ge concentration. The capacitance-voltage characteristics show similar frequency dispersion and leakage current for n-type and p-type epi-GaAs layers with very low hysteresis voltage (approximately 10 mV). PACS: 81.15.Gh. PMID:22297193

  3. Selective-area growth of heavily n-doped GaAs nanostubs on Si(001) by molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Chang, Yoon Jung; Simmonds, Paul J.; Beekley, Brett; Goorsky, Mark S.; Woo, Jason C. S.

    2016-04-01

    Using an aspect ratio trapping technique, we demonstrate molecular beam epitaxy of GaAs nanostubs on Si(001) substrates. Nanoholes in a SiO2 mask act as a template for GaAs-on-Si selective-area growth (SAG) of nanostubs 120 nm tall and ≤100 nm in diameter. We investigate the influence of growth parameters including substrate temperature and growth rate on SAG. Optimizing these parameters results in complete selectivity with GaAs growth only on the exposed Si(001). Due to the confined-geometry, strain and defects in the GaAs nanostubs are restricted in lateral dimensions, and surface energy is further minimized. We assess the electrical properties of the selectively grown GaAs nanostubs by fabricating heterogeneous p+-Si/n+-GaAs p-n diodes.

  4. Oxygen in GaAs - Direct and indirect effects

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.; Skowronski, M.; Pawlowicz, L.; Lagowski, J.

    1984-01-01

    Oxygen has profound effects on the key electronic properties and point defects of GaAs crystals. Thus, when added in the growth system, it decreases the free electron concentration and enhances the concentration of deep donors in the resulting crystals. Both of these effects are highly beneficial for achieving semi-insulating material and have been utilized for that purpose. They have been attributed to the tendency of oxygen to getter silicon impurities during crystal growth. Only recently, it has been found that oxygen in GaAs introduces also a midgap level, ELO, with essentially the same activation energy as EL2 but with four times greater electron capture cross section. The present report reassesses the electrical and optical properties of the midgap levels in GaAs crystals grown by the horizontal Bridgman (HB) and the Czochralski-LEC techniques. Emphasis is placed on the identification of the specific effects of ELO.

  5. Inherent photoluminescence Stokes shift in GaAs.

    PubMed

    Ullrich, Bruno; Singh, Akhilesh K; Barik, Puspendu; Xi, Haowen; Bhowmick, Mithun

    2015-06-01

    The intrinsic photoluminescence Stokes shift, i.e., the energy difference between optical band gap and emission peak, of 350 μm thick semi-insulating GaAs wafers is found to be 4 meV at room temperature. The result is based on the determination of the optical bulk band gap from the transmission trend via modified Urbach rule whose result is confirmed with the transmission derivative method. The findings reveal the detailed balance of the optically evoked transitions and disclose the intrinsic link between Stokes shift and the Urbach tail slope parameter.

  6. Electronic spin polarization and the spin-dependent bandstructure in GaAs probed by optically pumped NMR

    SciTech Connect

    Crooker, Scott A; Ramaswamy, Kannan; Mui, Stacy; Hayes, Sophia E; Pan, Xingyuan; Sanders, Gary D; Stanton, Christopher J

    2008-01-01

    High resolution optically pumped NMR (OPNMR) experiments are used to resolve fine features in the spin-dependent electronic structure of the valence bands in semi-insulating GaAs. By theoretically calculating oscillations in the OPNMR signal intensity with respect to the excitation energy, we have mapped out the conduction band electronic spin polarization under optical pumping. Comparison with a theoretical analysis of the oscillatory experimental features allows the extraction of semiconductor energy band parameters.

  7. Alloy formation during molecular beam epitaxy growth of Si-doped InAs nanowires on GaAs[111]B.

    PubMed

    Davydok, Anton; Rieger, Torsten; Biermanns, Andreas; Saqib, Muhammad; Grap, Thomas; Lepsa, Mihail Ion; Pietsch, Ullrich

    2013-08-01

    Vertically aligned InAs nanowires (NWs) doped with Si were grown self-assisted by molecular beam epitaxy on GaAs[111]B substrates covered with a thin SiO x layer. Using out-of-plane X-ray diffraction, the influence of Si supply on the growth process and nanostructure formation was studied. It was found that the number of parasitic crystallites grown between the NWs increases with increasing Si flux. In addition, the formation of a Ga0.2In0.8As alloy was observed if the growth was performed on samples covered by a defective oxide layer. This alloy formation is observed within the crystallites and not within the nanowires. The Ga concentration is determined from the lattice mismatch of the crystallites relative to the InAs nanowires. No alloy formation is found for samples with faultless oxide layers.

  8. Electrical properties of Mg-doped GaAs and AlxGa1-xAs (x<=0.36)

    NASA Astrophysics Data System (ADS)

    Csontos, L.; Podor, Balint; Somogyi, K.; Andor, L.

    1992-08-01

    Mg-doped GaAs and AlxGa1-xAs (x

  9. Direct identification of interstitial Mn in heavily p-type doped GaAs and evidence of its high thermal stability

    SciTech Connect

    Pereira, L. M. C.; Wahl, U.; Correia, J. G.; Decoster, S.; Vantomme, A.; Silva, M. R. da; Araujo, J. P.

    2011-05-16

    We report on the lattice location of Mn in heavily p-type doped GaAs by means of {beta}{sup -} emission channeling from the decay of {sup 56}Mn. The majority of the Mn atoms substitute for Ga and up to 31% occupy the tetrahedral interstitial site with As nearest neighbors. Contrary to the general belief, we find that interstitial Mn is immobile up to 400 deg. C, with an activation energy for diffusion of 1.7-2.3 eV. Such high thermal stability of interstitial Mn has significant implications on the strategies and prospects for achieving room temperature ferromagnetism in Ga{sub 1-x}Mn{sub x}As.

  10. Alloy formation during molecular beam epitaxy growth of Si-doped InAs nanowires on GaAs[111]B

    PubMed Central

    Davydok, Anton; Rieger, Torsten; Biermanns, Andreas; Saqib, Muhammad; Grap, Thomas; Lepsa, Mihail Ion; Pietsch, Ullrich

    2013-01-01

    Vertically aligned InAs nanowires (NWs) doped with Si were grown self-assisted by molecular beam epitaxy on GaAs[111]B substrates covered with a thin SiOx layer. Using out-of-plane X-ray diffraction, the influence of Si supply on the growth process and nanostructure formation was studied. It was found that the number of parasitic crystallites grown between the NWs increases with increasing Si flux. In addition, the formation of a Ga0.2In0.8As alloy was observed if the growth was performed on samples covered by a defective oxide layer. This alloy formation is observed within the crystallites and not within the nanowires. The Ga concentration is determined from the lattice mismatch of the crystallites relative to the InAs nanowires. No alloy formation is found for samples with faultless oxide layers. PMID:24046494

  11. CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES: Anomalous behaviours of terahertz reflected waves transmitted from GaAs induced by optical pumping

    NASA Astrophysics Data System (ADS)

    Shi, Yu-Lei; Zhou, Qing-Li; Zhao, Dong-Mei; Zhang, Cun-Lin

    2009-12-01

    Femtosecond pump-terahertz probe studies of carrier dynamics in semi-insulating GaAs have been investigated in detail for various pump powers. It is observed that, at high pump powers, the reflection peaks flip to the opposite polarity and dramatically enhance as the pump arrival time approaches the reflected wave of the terahertz pulse. The abnormal polarity-flip and enhancement can be interpreted by the pump-induced enhancement in the photoconductivity of GaAs and half-wave loss. Moreover, the carrier relaxation processes and surface states filling in GaAs are also studied in these measurements.

  12. Quantitative analysis of the effects of vertical magnetic fields on microsegregation in Te-doped LEC GaAs

    NASA Technical Reports Server (NTRS)

    Carlson, D. J.; Witt, A. F.

    1992-01-01

    Using near-IR transmission microscopy with computational absorption analysis, the effects of axial magnetic fields on micro- and macrosegregation during LP-LEC growth of GaAs were quantitatively investigated with a spatial resolution approaching 2 microns. Segregation inhomogeneities exceeding one order of magnitude are found to be related to fluid dynamics of the melt. The applicability of the BPS theory as well as the nonapplicability of the Cochran analysis are established.

  13. Optical absorption and photocurrent enhancement in semi-insulating gallium arsenide by femtosecond laser pulse surface microstructuring.

    PubMed

    Zhao, Zhen-Yu; Song, Zhi-Qiang; Shi, Wang-Zhou; Zhao, Quan-Zhong

    2014-05-19

    We observe an enhancement of optical absorption and photocurrent from semi-insulating gallium arsenide (SI-GaAs) irradiated by femtosecond laser pulses. The SI-GaAs wafer is treated by a regeneratively amplified Ti: Sapphire laser of 120 fs laser pulse at 800 nm wavelength. The laser ablation induced 0.74 μm periodic ripples, and its optical absorption-edge is shifted to a longer wavelength. Meanwhile, the steady photocurrent of irradiated SI-GaAs is found to enhance 50%. The electrical properties of samples are calibrated by van der Pauw method. It is found that femtosecond laser ablation causes a microscale anti-reflection coating surface which enhances the absorption and photoconductivity.

  14. Terahertz emission enhancement in semi-insulating gallium arsenide integrated with subwavelength one-dimensional metal line array.

    PubMed

    Faustino, Maria Angela B; Lopez, Lorenzo P; Pauline Afalla, Jessica; Muldera, Joselito; Hermosa, Nathaniel; Salvador, Arnel A; Somintac, Armando S; Estacio, Elmer S

    2016-10-01

    A one-order-of-magnitude terahertz (THz) emission enhancement in the transmission geometry, over a 0.7-THz broadband range, was observed in semi-insulating gallium arsenide (SI-GaAs) integrated with a subwavelength one-dimensional metal line array (1DMLA). THz emission of the 1DMLA samples showed an intensity increase and exhibited a full-width-at-half-maximum broadening relative to the emission of the bare substrate. Improved index matching could not account for the observed phenomenon. A nonlinear dependence of the integrated THz emission intensity on the number of illuminated lines and on the pump power was observed. The actual origin of the increased THz emission is still under investigation. At present, it is attributed to extraordinary optical transmission.

  15. Photodetectors based on carbon nanotubes deposited by using a spray technique on semi-insulating gallium arsenide.

    PubMed

    Melisi, Domenico; Nitti, Maria Angela; Valentini, Marco; Valentini, Antonio; Ligonzo, Teresa; De Pascali, Giuseppe; Ambrico, Marianna

    2014-01-01

    In this paper, a spray technique is used to perform low temperature deposition of multi-wall carbon nanotubes on semi-insulating gallium arsenide in order to obtain photodectors. A dispersion of nanotube powder in non-polar 1,2-dichloroethane is used as starting material. The morphological properties of the deposited films has been analysed by means of electron microscopy, in scanning and transmission mode. Detectors with different layouts have been prepared and current-voltage characteristics have been recorded in the dark and under irradiation with light in the range from ultraviolet to near infrared. The device spectral efficiency obtained from the electrical characterization is finally reported and an improvement of the photodetector behavior due to the nanotubes is presented and discussed.

  16. Subgap time of flight: A spectroscopic study of deep levels in semi-insulating CdTe:Cl

    NASA Astrophysics Data System (ADS)

    Pousset, J.; Farella, I.; Gambino, S.; Cola, A.

    2016-03-01

    We report on a study of deep levels in semi-insulating CdTe:Cl by means of a time-of-flight spectral approach. By varying the wavelength of a pulsed optical source within the CdTe energy gap, transitions to/from localized levels generate free carriers which are analysed through the induced photocurrent transients. Both acceptor-like centers, related to the A-center, and a midgap level, 0.725 eV from the valence band, have been detected. The midgap level is close to the Fermi level and is possibly a recombination center responsible for the compensation mechanism. When the irradiance is varied, either linear or quadratic dependence of the electron and hole collected charge are observed, depending on the dominant optical transitions. The analysis discloses the potentiality of such a novel approach exploitable in the field of photorefractive materials as well as for deep levels spectroscopy.

  17. Deep-defect-induced quenching effects in semi-insulating GaN layers detected by photoelectrical spectroscopic techniques

    NASA Astrophysics Data System (ADS)

    Witte, H.; Krtschil, A.; Lisker, M.; Schrenk, E.; Christen, J.; Krost, A.; Kuhn, B.; Scholz, F.

    2003-06-01

    Quenching effects induced by additional below-bandgap illumination in undoped semi-insulating GaN were investigated using optical admittance spectroscopy (OAS) and photocurrent (PC) spectroscopy as well as optically excited, thermally stimulated currents (TSC). In OAS and PC, a decrease of defect-related signals due to the quenching light was observed. The thermal quenching of the defect band between 2.7 and 3.3 eV shows a good agreement with thermal emissions as measured by TSC, indicating the same defects cause the optical transitions in OAS/PC and the thermal transitions in TSC. The thermal emission in the temperature region between 250 and 300 K, which is responsible for the thermal quenching of the blue band (BB) in OAS, also shows an optical quenching under below-bandgap excitation.

  18. Cathodoluminescence Characterization of Ion Implanted GaAs.

    DTIC Science & Technology

    1980-03-01

    into GaAs. In their experi- ment, GaAs thin films were grown on MgA12 4 spinel substrates. When the electrons had sufficient energy they caused the...sections. Growing The epi-layers were grown on a chromium doped GaAs substrate using a vapor phase epitaxial growth technique. They were grown by G

  19. Nonlinear optical properties of GaAs at 1. 06 micron, picosecond pulse investigation and applications

    SciTech Connect

    Cui, A.G.

    1992-01-01

    The author explores absorptive and refractive optical nonlinearities at 1.06 [mu]m in bulk, semi-insulating, undoped GaAs with a particular emphasis on the influence of the native deep-level defect known as EL2. Picosecond pump-probe experimental technique is used to study the speed, magnitude, and origin of the absorptive and refractive optical nonlinearities and to characterize the dynamics of the optical excitation of EL2 in three distinctly different undoped, semi-insulating GaAs samples. Intense optical excitation of these materials leads to the redistribution of charge among the EL2 states resulting in an absorptive nonlinearity due to different cross sections for electron and hole generation through this level. This absorptive nonlinearity is used in conjunction with the linear optical properties of the material and independent information regarding the EL2 concentration to extract the cross section ratio [sigma][sub p]/[sigma][sub e] [approx equal]0.8, where [sigma][sub p](e) is the absorption cross section for hole (electron) generation from EL2[sup +] (EL2[sup 0]). The picosecond pump-probe technique can be used to determine that EL2/EL2[sup +]density ratio in an arbitrary undoped, semi-insulating GaAs sample. The author describes the use of complementary picosecond pump-probe techniques that are designed to isolate and quantify cumulative and instantaneous absorptive and refractive nonlinear processes. Numerical simulations of the measurements are achieved by solving Maxwell equations with the material equations in a self-consistent manner. The numerical analysis together with the experimental data allows extraction of a set of macroscopic nonlinear optical parameters in undoped GaAs. The nonlinearities in this material have been used to construct three proof-of-principle nonlinear optical devices for use at 1.06 [mu]m: (1) a weak beam amplifier, (2) a polarization rotation optical switch, and (3) optical limiters.

  20. The investigation of custom grown vertical zone melt semi-insulating bulk gallium arsenide as a radiation spectrometer

    SciTech Connect

    McGregor, D.S.; Antolak, A.J.; Chui, H.C.

    1996-06-01

    Vertical zone melt (VZM) bulk GaAs boules have been zone refined (ZR) and zone leveled (ZL) to reduce EL2 deep donor levels and impurity concentrations with the intent of improving properties for gamma ray detectors. Zr and Zl GaAs boules had background impurity levels and deep donor EL2 concentrations near or below detectable limits. The crystal mosaic of the material at locations near the seed end was slightly superior to commercial liquid encapsulated Czochralski (LEC) material, and nearly equivalent to commercial vertical gradient freeze (VGF) material. The crystal mosaic in ZL material degraded towards the tail end. The homogeneity of the electrical properties for the ZL and ZR VZM material was inferior compared to commercially available bulk GaAs material. Post growth annealing may help to homogenize some electrical properties of the material. The charge collection efficiency of the ZR GaAs detectors was only 30% maximum, and only 25% maximum for the ZL GaAs detectors. Resulting gamma ray spectra was poor from detectors fabricated with the ZL or ZR VZM material. Detectors fabricated from material that was both ZR and ZL did not demonstrate gamma ray resolution, and operated mainly as counters. The poor spectroscopic performance is presently attributed to the inhomogeneity of the electrical properties of the ZR and ZL GaAs materials. Comparisons are made with detectors fabricated from VGF SI bulk GaAs.

  1. Structural properties of pressure-induced structural phase transition of Si-doped GaAs by angular-dispersive X-ray diffraction

    NASA Astrophysics Data System (ADS)

    Lin, Kung-Liang; Lin, Chih-Ming; Lin, Yu-Sheng; Jian, Sheng-Rui; Liao, Yen-Fa; Chuang, Yu-Chun; Wang, Chuan-Sheng; Juang, Jenh-Yih

    2016-02-01

    Pressure-induced phase transitions in n-type silicon-doped gallium arsenide (GaAs:Si ) at ambient temperature were investigated by using angular-dispersive X-ray diffraction (ADXRD) under high pressure up to around 18.6 (1) GPa, with a 4:1 (in volume ratio) methanol-ethanol mixture as the pressure-transmitting medium. In situ ADXRD measurements revealed that n-type GaAs:Si starts to transform from zinc- blende structure to an orthorhombic structure [GaAs-II phase], space group Pmm2, at 16.4 (1) GPa. In contrast to previous studies of pure GaAs under pressure, our results show no evidence of structural transition to Fmmm or Cmcm phase. The fitting of volume compression data to the third-order Birch-Murnaghan equation of state yielded that the zero-pressure isothermal bulk moduli and the first-pressure derivatives were 75 (3) GPa and 6.4 (9) for the B3 phase, respectively. After decompressing to the ambient pressure, the GaAs:Si appears to revert to the B3 phase completely. By fitting to the empirical relations, the Knoop microhardness numbers are between H PK = 6.21 and H A = 5.85, respectively, which are substantially smaller than the values of 7-7.5 for pure GaAs reported previously. A discontinuous drop in the pressure-dependent lattice parameter, N- N distances, and V/ V 0 was observed at a pressure of 11.5 (1) GPa, which was tentatively attributed to the pressure-induced dislocation activities in the crystal grown by vertical gradient freeze method.

  2. GaAs thin film epitaxy and x-ray detector development

    NASA Astrophysics Data System (ADS)

    Wynne, Dawnelle I.; Cardozo, B.; Haller, Eugene E.

    1999-10-01

    We report on the growth of high purity n-GaAs using Liquid Phase Epitaxy and on the fabrication of Schottky barrier diodes for use as x-ray detectors using these layers. Our epilayers are grown form an ultra-pure Ga solvent in a graphite boat in a hydrogen atmosphere. Growth is started at a temperature of approximately 800 degrees C; the temperature is ramped down at 2 degrees C/min. to room temperature. Our best epilayers show a net-residual-donor concentration of approximately 2 X 1012 cm-3, measured by Hall effect. Electron mobilities as high as 150,000 cm2 V-1 s-1 at 77K have been obtained. The residual donors have been analyzed by far IR photothermal ionization spectroscopy and found to be sulfur and silicon. Up to approximately 200 micrometers of epitaxial GaAs have been deposited using several sequential growth runs on semi-insulating and n+-doped substrates. Schottky barrier diodes have been fabricated using this epitaxial material and have been electrically characterized by current-voltage and capacitance-voltage measurements. The Schottky barriers are formed by electron beam evaporation of Pt films. The ohmic contacts are made by electron beam evaporated and alloyed Ni-Ge-Au films on the backside of the substrate. Several of our diodes exhibit dark currents of the order of 0.3-3.3 nA/mm2 at reverse biases depleting approximately 50 micrometers of the epilayer. Electrical characteristics and preliminary performance results of our Schottky diodes using 109Cd and 241Am gamma and x- ray radiation will be discussed.

  3. The effects of the magnitude of the modulation field on electroreflectance spectroscopy of undoped-n+ type doped GaAs

    NASA Astrophysics Data System (ADS)

    Wang, D. P.; Huang, K. M.; Shen, T. L.; Huang, K. F.; Huang, T. C.

    1998-01-01

    The electroreflectance (ER) spectra of an undoped-n+ type doped GaAs has been measured at various amplitudes of modulating fields (δF). Many Franz-Keldysh oscillations were observed above the band gap energy, thus enabling the electric field (F) in the undoped layer to be determined. The F is obtained by applying fast Fourier transformation to the ER spectra. When δF is small, the power spectrum can be clearly resolved into two peaks, which corresponds to heavy- and light-hole transitions. When δF is less than ˜1/8 of the built-in field (Fbi˜77 420 V/cm), the F deduced from the ER is almost independent of δF. However, when larger than this, F is increased with δF. Also, when δF is increased to larger than ˜1/8 of Fbi, a shoulder appears on the right side of the heavy-hole peak of the power spectrum. The separation between the main peak and the shoulder of the heavy-hole peak becomes wider as δF becomes larger.

  4. Effect of quantum dot position and background doping on the performance of quantum dot enhanced GaAs solar cells

    SciTech Connect

    Driscoll, Kristina Bennett, Mitchell F.; Polly, Stephen J.; Forbes, David V.; Hubbard, Seth M.

    2014-01-13

    The effect of the position of InAs quantum dots (QD) within the intrinsic region of pin-GaAs solar cells is reported. Simulations suggest placing the QDs in regions of reduced recombination enables a recovery of open-circuit voltage (V{sub OC}). Devices with the QDs placed in the center and near the doped regions of a pin-GaAs solar cell were experimentally investigated. While the V{sub OC} of the emitter-shifted device was degraded, the center and base-shifted devices exhibited V{sub OC} comparable to the baseline structure. This asymmetry is attributed to background doping which modifies the recombination profile and must be considered when optimizing QD placement.

  5. Development and characterization of zone melt growth GaAs for gamma-ray detectors

    SciTech Connect

    King, S.E.; Dietrich, H.B.; Henry, R.L.; Katzer, D.S.; Moore, W.J.; Phillips, G.W.; Mania, R.C.

    1996-06-01

    GaAs is a potentially attractive material for room temperature x-ray and {gamma}-ray spectrometers. To date, the only high resolution GaAs devices were produced by epitaxial growth. The usefulness of detectors made from bulk grown semi-insulating (SI) GaAs has been limited by low charge collection efficiency caused, it is believed, by the high density of EL2 deep donor defects. Vertical zone melt (VZM) growth of GaAs has recently been developed at the Naval Research Laboratory. Zone refining and zone leveling techniques were used with VZM to reduce the level of impurities and the EL2 defects in bulk SI-GaAs. Schottky barrier and PIN diodes have been fabricated from the newly grown material. These devices were characterized using {alpha} particles and {gamma}-rays. In this paper, the measurements and analysis of the first VZM GaAs devices are presented and compared with commercially available GaAs. The intent is to test the hypothesis that high purity, low defect GaAs material growth could lead to improved radiation detectors.

  6. Electron-paramagnetic-resonance study of the isolated arsenic antisite in electron irradiated GaAs and its relation to the EL2 center

    SciTech Connect

    Rong, F.C.; Buchwald, W.R.; Harmatz, M.; Poindexter, E.H. ); Warren, W.L. )

    1991-10-28

    Arsenic antisites produced in GaAs by room-temperature electron irradiation (RTEI) are examined by electron paramagnetic resonance (EPR). For the first time, this RTEI antisite, which has been believed to be the isolated antisite, is found to be metastable. The most efficient photon energy for photoquenching is found to be approximately 1.15 eV, which is very close to that observed for the well-known EL2 center in undoped semi-insulating GaAs. However, the thermal recovery temperature is about 200--250 K, much higher than that for the EL2 center.

  7. Improvement of radiation stability of semi-insulating gallium arsenide crystals by deposition of diamond-like carbon films

    NASA Astrophysics Data System (ADS)

    Klyui, N. I.; Lozinskii, V. B.; Liptuga, A. I.; Izotov, V. Yu.; Han, Wei; Liu, Bingbing

    2016-12-01

    We studied the properties of optical elements for the IR spectral range based on semi-insulating gallium arsenide (SI-GaAs) and antireflecting diamond-like carbon films (DLCF). Particular attention has been paid to the effect of penetrating γ-radiation on transmission of the developed optical elements. A Co60 source and step-by-step gaining of γ-irradiation dose were used for treatment of both an initial SI-GaAs crystal and DLCF/SI-GaAs structures. It was shown that DLCF deposition essentially increases degradation resistance of the SI-GaAs-based optical elements to γ-radiation. Particularly, the transmittance of the DLCF/SI-GaAs structure after γ-irradiation with a dose 9ṡ104 Gy even exceeds that of initial structures. The possible mechanism that explains the effect of γ-radiation on the SI-GaAs crystals and the DLCF/SI-GaAs structures at different irradiation doses was proposed. The effect of small doses is responsible for non-monotonic transmission changes in both SI-GaAs crystals and DLCF/SI-GaAs structures. At further increasing the γ-irradiation dose, the variation of properties of both DLCF and SI-GaAs crystal influences on the transmission of DLCF/SI-GaAs system. At high γ-irradiation dose 1.4ṡ105 Gy, passivation of radiation defects in the SI-GaAs bulk by hydrogen diffused from DLCF leads to increasing the degradation resistance of the SI-GaAs crystals coated with DLCF as compared with the crystals without DLCF.

  8. High Energy Neutron Irradiation Effects in GaAs Modulation-Doped Field Effect Transistors (MODFETS): Threshold Voltage

    DTIC Science & Technology

    1989-06-15

    PREFACE We would like to thank B. K. Janousek, W. E. Yamada, and L. W. Aukerman for their technical assistance in this study. Aceession For [iTIS CRA...Doped GaAs-(AlGa)As Heterostructures," Surface Science, 132, 519-526, (1983). 8. L. W. Aukerman , "Radiation-Produced Energy Levels in Compound Semi...conductors," J. Appl. Phys. LO, 1239-1243, (Aug. 1959). 9. L. W. Aukerman , "Radiation Effects," in Semiconductors and Semimetals: Physics of III-V

  9. Photo-carrier and Electronic Studies of Silicon-Doped GaAs Grown by MBE Using PCR

    NASA Astrophysics Data System (ADS)

    Villada, J. A.; Jiménez-Sandoval, S.; López-López, M.; Mendoza, J.; Espinosa-Arbeláez, D. G.; Rodríguez-García, M. E.

    2010-05-01

    Photo-carrier radiometry (PCR) has been used to study the distribution of impurities and the lattice damage in silicon-doped gallium arsenide in a noncontact way. The results from the PCR study are correlated with Hall effect measurements. Samples for this study were grown by molecular beam epitaxy. Of all possible parameters that can be manipulated, the silicon effusion cell temperature was the only one that was varied, in order to obtain samples with different silicon concentrations. The distribution of impurities was obtained by scanning the surface of each sample. The PCR amplitude and phase images were obtained as a function of the x- y position. According to the PCR images, it is evident that the impurities are not uniformly distributed across the sample. From these images, the average value of the amplitude and phase data across the surface was obtained for each sample in order to study the PCR signal behavior as a function of the silicon effusion cell temperature.

  10. Index grating lifetime in photorefractive GaAs

    NASA Technical Reports Server (NTRS)

    Cheng, Li-Jen; Partovi, Afshin

    1988-01-01

    The index grating lifetime in liquid encapsulated Czochralski-grown undoped semi-insulating GaAs was measured using a beam coupling technique. The largest lifetime measure was about 8 s under a read beam intensity of 0.7 mW/sq cm with the grating periodicity being 0.63 microns. The measured value decreases to milliseconds as the read beam intensity and the grating periodicity increase to about 10 mW/sq cm and 4 microns, respectively. This range of grating lifetime in this material is adequate for its use in real-time spatial light modulators, reconfigurable beam steering devices, and dynamic memory elements, for optical computing. In addition, the results suggest that the lifetime is sensitive to residual imperfections in the crystal.

  11. Integration of front-end electronics with GaAs pixel detectors: Experimental and feasibility analysis

    SciTech Connect

    Bertuccio, G.; Longoni, A.; De Geronimo, G.; Canali, C.; Lanzieri, C.; Nava, F.

    1999-08-01

    This work aims to study the feasibility of the integration, on the same chip, of GaAs pixel detectors and frontend electronics employing GaAs metal semiconductor FET`s (MESFET`s) or high electron mobility transistors (HEMT`s). The interest of fully integrated GaAs systems lies in X and {gamma}-ray spectroscopy and Imaging for scientific, industrial, and medical applications. The system design criteria and the prediction of the performance have been derived on the basis of recent experimental results on semi-insulating GaAs pixel detectors. Measurements of the relevant parameters of GaAs FET`s suitable for the stringent requirements of a specroscopy-grade frontend amplifier are analyzed. It is shown that an optimized GaAs integrated system can reach an electronic noise level below 100 electrons rms (<1 keV FWHM) even at room temperature. Some open problems regarding the detector-electronics integration are highlighted and discussed.

  12. Deep level defect studies in semi-insulating 4H- and 6H-silicon carbide using optical admittance spectroscopy

    NASA Astrophysics Data System (ADS)

    Lee, Wonwoo

    The objective of this study is to determine the deep vanadium defect levels in semi-insulating 4H- and 6H- silicon carbide using optical admittance spectroscopy. Also infrared spectroscopy and electron paramagnetic resonance spectroscopy are conducted to support the evidence of vanadium donor and acceptor levels obtained from OAS measurements. Vanadium acts as an amphoteric impurity in silicon carbide with a V3+/4+ acceptor level and V4+/5+ donor level. Although the value for the donor level is well established, the V3+/4+ defect level remains controversial. OAS shows that the vanadium donor level is isolated near Ec-1.7 eV, and the vanadium acceptor level is located at Ec-0.75 eV at a cubic site and Ec-0.94 eV at a hexagonal site in 4H-SiC, while the vanadium donor level of 6H-SiC samples is about Ec-1.5 eV. The acceptor levels of 6H-SiC were assigned to Ec-0.67 eV, E c -0.70 eV at two cubic sites, and Ec-0.87 eV at a hexagonal site. IR spectra demonstrated that the signatures of the vanadium V 3+ and V4+ charge states are present in the samples. EPR and photo-induced EPR are used to identify the V3+/4+ and V4+/5+ levels as well as the V3+ and V 4+ charge states. EPR spectra represent both V3+ and V4+ in 4H- and 6H samples consistent with FTIR data. EPR and photo-induced EPR suggest that the va nadium acceptor level is between 0.7 eV and 0.86 eV, while the donor level is near Ec-1.5 eV in 6H-SiC. The donor level of 4H-SiC is located at Ec-1.6 eV. Thus, the data obtained from EPR and FTIR support the assignment of the vanadium defect levels determined by OAS. Vanadium complexes induced by other elements such as titanium, hydrogen, and nitrogen atoms are also observed in OAS spectra and will be discussed in the text.

  13. Coherent dynamics of Landau-Levels in modulation doped GaAs quantum wells at high magnetic fields

    NASA Astrophysics Data System (ADS)

    Liu, Cunming; Paul, Jagannath; Reno, John; McGill, Stephen; Hilton, David; Karaiskaj, Denis

    By using two-dimensional Fourier transform spectroscopy, we investigate the dynamics of Landau-Levels formed in modulation doped GaAs/AlGaAs quantum wells of 18 nm thickness at high magnetic fields and low temperature. The measurements show interesting dephasing dynamics and linewidth dependency as a function of the magnetic field. The work at USF and UAB was supported by the National Science Foundation under grant number DMR-1409473. The work at NHMFL, FSU was supported by the National Science Foundation under grant numbers DMR-1157490 and DMR-1229217. This work was performed, in part, at the Center for Integrated Nanotechnologies, a U.S. Department of Energy, Office of Basic Energy Sciences user facility. Sandia National Laboratories is a multi-program laboratory managed and operated by Sandia Corporation, a wholly owned subsidiary of Lockheed Martin Corporation, for the U.S. Department of Energy's National Nuclear Security Administration under Contract No. DE-AC04-94AL85000.

  14. Enhanced NMR with Optical Pumping Yields (75)As Signals Selectively from a Buried GaAs Interface.

    PubMed

    Willmering, Matthew M; Ma, Zayd L; Jenkins, Melanie A; Conley, John F; Hayes, Sophia E

    2017-03-22

    We have measured the (75)As signals arising from the interface region of single-crystal semi-insulating GaAs that has been coated and passivated with an aluminum oxide film deposited by atomic layer deposition (ALD) with optically pumped NMR (OPNMR). Using wavelength-selective optical pumping, the laser restricts the volume from which OPNMR signals are collected. Here, OPNMR signals were obtained from the interface region and distinguished from signals arising from the bulk. The interface region is highlighted by interactions that disrupt the cubic symmetry of the GaAs lattice, resulting in quadrupolar satellites for nuclear [Formula: see text] isotopes, whereas NMR of the "bulk" lattice is nominally unsplit. Quadrupolar splitting at the interface arises from strain based on lattice mismatch between the GaAs and ALD-deposited aluminum oxide due to their different coefficients of thermal expansion. Such spectroscopic evidence of strain can be useful for measuring lattice distortions at heterojunction boundaries and interfaces.

  15. Multiple Applications of GaAs semiconductors

    NASA Astrophysics Data System (ADS)

    Martel, Jenrené; Wonka, Willy

    2003-03-01

    The object of this discussion will be to explore the many facets of Gallium Arsenide(GaAs) semiconductors. The session will begin with a brief overview of the basic properties of semiconductors in general(band gap, doping, charge mobility etc.). It will then follow with a closer look at the properties of GaAs and how these properties could potentially translate into some very exciting applications. Furthermore, current applications of GaAs semiconductors will be dicussed and analyzed. Finally, physical limits and advantages/disadvantages of GaAs will be considered.

  16. Investigation of GaAs photoconductive switches triggered by 900nm semiconductor lasers

    NASA Astrophysics Data System (ADS)

    Ma, Deming; Shi, Wei; Ma, Xiangrong; Wang, Xinmei; Pei, Tao

    2008-12-01

    Experiment of a lateral semi-insulating GaAs photoconductive semiconductor switch (SI-GaAs PCSS) with different electrode gaps triggered by 900nm semiconductor laser is reported. With the biased voltage of 0.2KV~3.0KV, the linear electrical pulse is outputted by SI-GaAs PCSS. When laser energy is very low, the semi-insulating GaAs PCSS with 1.5mm electrode gap is triggered by laser pulse, the output electrical pulse samples is instable. When the energy of the laser increases, the amplitude and the width of the electrical pulse also increase. It indicates that a stable electrical pulse is obtained while laser energy is high. With the biased voltage of 2.8kV, the SI-GaAs PCSS with 3mm electrode gap is triggered by laser pulse about 10nJ in 200ns at 900nm. The SI-GaAs PCSS switches a electrical pulse with a voltage up to 80V. The absorption mechanism by Franz-Keldysh effect under high-intensity electric field and EL2 deep level defects is discussed.

  17. Stoichiometry-controlled compensation in liquid encapsulated Czochralski GaAs

    NASA Technical Reports Server (NTRS)

    Holmes, D. E.; Chen, R. T.; Elliott, K. R.; Kirkpatrick, C. G.

    1982-01-01

    It is shown that the electrical compensation of undoped GaAs grown by the liquid encapsulated Czochralski technique is controlled by the melt stoichiometry. The concentration of the deep donor EL2 in the crystal depends on the As concentration in the melt, increasing from about 5 x 10 to the 15th per cu cm to 1.7 x 10 to the 16th per cu cm as the As atom fraction increases from 0.48 to 0.51. Furthermore, it is shown that the free-carrier concentration of semi-insulating GaAs is determined by the relative concentrations of EL2 and carbon acceptors. As a result, semi-insulating material can be obtained only above a critical As concentration (0.475-atom fraction in the material here) where the concentration of EL2 is sufficient to compensate residual acceptors. Below the critical As concentration the material is p type due to excess acceptors.

  18. Transient surface photoconductivity of GaAs emitter studied by terahertz pump-emission spectroscopy

    NASA Astrophysics Data System (ADS)

    Shi, Yulei; Zhou, Qing-li; Zhang, Cunlin

    2010-11-01

    The ultrafast carrier dynamics and surface photoconductivity of unbiased semi-insulating GaAs have been investigated in detail by using terahertz pump-emission technique. Through theoretical modeling based on Hertz vector potential, it is found that transient photoconductivity plays a very important role in the temporal waveform of terahertz radiation pulse. Anomalous enhancement in both terahertz radiation and transient photoconductivity is observed subsequent to the excitation of pump pulse, and our modeling gives successful analyses for the dynamics of photogenerated carriers in the GaAs. We attribute these phenomena to carrier capture in the EL2 centers. Moreover, the pump power- and temperaturedependent measurements are also performed to verify this model.

  19. EL2 distributions in vertical gradient freeze GaAs crystals

    SciTech Connect

    Gray, M.L.; Sargent, L.; Blakemore, J.S.; Parsey J.M. Jr.; Clemans, J.E.

    1988-06-15

    Spatial distributions of EL2 in undoped, semi-insulating GaAs crystals grown by a novel vertical gradient freeze (VGF) method are reported. As a result of the low-temperature gradients present during growth and post-solidification cooling, these crystals exhibit lower EL2 concentrations and lower dislocation densities than liquid-encapsulated Czochralski crystals. Both the EL2 distribution and dislocation density over the area of a wafer do not display the fourfold symmetric pattern prevalent for LEC-grown GaAs. The radial distributions of EL2 in as-grown VGF crystals have been found to be independent of the dislocation density. Axial and radial Hall-effect measurements are included. Thermal activation energies are also presented and the compensation mechanism for this material is discussed.

  20. The Investigation of Ion Implantation as a Technique for Manufacturing GaAs Magneto-Sensitive Detectors

    NASA Astrophysics Data System (ADS)

    Karlova, G. F.; Avdochenko, B. I.

    2017-01-01

    This paper studies thin active layers of n-n i and n +-n-n i -types produced by means of silicon ion implantation into a semi-insulating GaAs substrate. The results of these structures’ physical parameters investigation are presented. Based on the structures the Hall-effect sensors are designed that have the linearity of Hall voltage dependency on magnetic density UH(B) of at least 1% in the range of up to B<1.2 T.

  1. INTERNATIONAL CONFERENCE ON SEMICONDUCTOR INJECTION LASERS SELCO-87: Doping inhomogeneities and behavior of compensation of n-type GaAs and InP

    NASA Astrophysics Data System (ADS)

    Wruck, D.; Knauer, A.

    1988-11-01

    A comparison was made of the distributions of Sn and of the chalcogens S and Se in InP and GaAs, determined from infrared absorption and the Hall effect. An analysis was made of the possible cause of the difference between the values of the degree of compensation determined by the two methods.

  2. Application of a Resistance Heater to the MOCVD (Metal-Organic Chemical Vapor Deposition) Growth of Undoped and Se-Doped GaAS.

    DTIC Science & Technology

    1985-03-08

    concentration and mobilities of the epitaxial layers were determined at room temperature and liquid-nitrogen temperature (77 K) by the van der Pauw technique’ for...mobility versus total impurity concentration for bulk GaAs (Ref. 7). 13 REFERENCES 1. van der Pauw , L. J., PhlisRes ep. 13, 1 (1958). 2. Binet, M., Electron

  3. LEC GaAs for integrated circuit applications

    NASA Technical Reports Server (NTRS)

    Kirkpatrick, C. G.; Chen, R. T.; Homes, D. E.; Asbeck, P. M.; Elliott, K. R.; Fairman, R. D.; Oliver, J. D.

    1984-01-01

    Recent developments in liquid encapsulated Czochralski techniques for the growth of semiinsulating GaAs for integrated circuit applications have resulted in significant improvements in the quality and quantity of GaAs material suitable for device processing. The emergence of high performance GaAs integrated circuit technologies has accelerated the demand for high quality, large diameter semiinsulating GaAs substrates. The new device technologies, including digital integrated circuits, monolithic microwave integrated circuits and charge coupled devices have largely adopted direct ion implantation for the formation of doped layers. Ion implantation lends itself to good uniformity and reproducibility, high yield and low cost; however, this technique also places stringent demands on the quality of the semiinsulating GaAs substrates. Although significant progress was made in developing a viable planar ion implantation technology, the variability and poor quality of GaAs substrates have hindered progress in process development.

  4. Analysis of intensity dependent near-bandedge absorption in semi-insulating 4H–SiC for photoconductive switch applications

    NASA Astrophysics Data System (ADS)

    Meyers, V.; Chowdhury, A. R.; Mauch, D.; Dickens, J. C.; Neuber, A. A.; Joshi, R. P.

    2017-04-01

    We report on the intensity-dependent behavior of the absorption coefficient (α) in semi-insulating 4H–SiC material. Data from as-received samples show a monotonic decrease in α with incident energy density, with a pronounced change in slope at around 10 mJ cm‑2. Annealed samples, on the other hand, exhibit an experimental trend of increasing α with intensity. Qualitative explanation of the observed behavior is presented that probes the possible role of spontaneous and stimulated emission for as-received samples. With annealing, trap related recombination is strongly reduced leading to higher carrier densities and increased free-carrier absorption with incident intensity. The role of band-filling and permittivity changes are shown to be inconsequential, while changes in internal fields could contribute to decreases in absorption.

  5. On the relation between deep level compensation, resistivity and electric field in semi-insulating CdTe:Cl radiation detectors

    NASA Astrophysics Data System (ADS)

    Cola, Adriano; Farella, Isabella; Pousset, Jeremy; Valletta, Antonio

    2016-12-01

    A compensation model for semi-insulating CdTe:Cl based on a single dominant deep level 0.725 eV above the valence band is proposed. The model is corroborated by experimental evidence: resistivity measurements as a function of temperature on bulk crystals and stationary electric field distributions in Ohmic/Schottky radiation detectors, obtained by the Pockels effect. The latter are in close agreement with the numerical solutions of transport equations when considering the deep centre concentration in the range 2 - 4 × 1012 cm-3, and a compensation ratio R = 2.1, this one being consistent with an original ambipolar analysis of resistivity. More generally, the approach elucidates the role of electrical contacts and deep levels in controlling the electric fields in devices based on compensated materials.

  6. High temperature annealing effects on deep-level defects in a high purity semi-insulating 4H-SiC substrate

    NASA Astrophysics Data System (ADS)

    Iwamoto, Naoya; Azarov, Alexander; Ohshima, Takeshi; Moe, Anne Marie M.; Svensson, Bengt G.

    2015-07-01

    Effects of high-temperature annealing on deep-level defects in a high-purity semi-insulating 4H silicon carbide substrate have been studied by employing current-voltage, capacitance-voltage, junction spectroscopy, and chemical impurity analysis measurements. Secondary ion mass spectrometry data reveal that the substrate contains boron with concentration in the mid 1015 cm-3 range, while other impurities including nitrogen, aluminum, titanium, vanadium and chromium are below their detection limits (typically ˜1014 cm-3). Schottky barrier diodes fabricated on substrates annealed at 1400-1700 °C exhibit metal/p-type semiconductor behavior with a current rectification of up to 8 orders of magnitude at bias voltages of ±3 V. With increasing annealing temperature, the series resistance of the Schottky barrier diodes decreases, and the net acceptor concentration in the substrates increases approaching the chemical boron content. Admittance spectroscopy results unveil the presence of shallow boron acceptors and deep-level defects with levels in lower half of the bandgap. After the 1400 °C annealing, the boron acceptor still remains strongly compensated at room temperature by deep donor-like levels located close to mid-gap. However, the latter decrease in concentration with increasing annealing temperature and after 1700 °C, the boron acceptor is essentially uncompensated. Hence, the deep donors are decisive for the semi-insulating properties of the substrates, and their thermal evolution limits the thermal budget for device processing. The origin of the deep donors is not well-established, but substantial evidence supporting an assignment to carbon vacancies is presented.

  7. High temperature annealing effects on deep-level defects in a high purity semi-insulating 4H-SiC substrate

    SciTech Connect

    Iwamoto, Naoya Azarov, Alexander; Svensson, Bengt G.; Ohshima, Takeshi; Moe, Anne Marie M.

    2015-07-28

    Effects of high-temperature annealing on deep-level defects in a high-purity semi-insulating 4H silicon carbide substrate have been studied by employing current-voltage, capacitance-voltage, junction spectroscopy, and chemical impurity analysis measurements. Secondary ion mass spectrometry data reveal that the substrate contains boron with concentration in the mid 10{sup 15 }cm{sup −3} range, while other impurities including nitrogen, aluminum, titanium, vanadium and chromium are below their detection limits (typically ∼10{sup 14 }cm{sup −3}). Schottky barrier diodes fabricated on substrates annealed at 1400–1700 °C exhibit metal/p-type semiconductor behavior with a current rectification of up to 8 orders of magnitude at bias voltages of ±3 V. With increasing annealing temperature, the series resistance of the Schottky barrier diodes decreases, and the net acceptor concentration in the substrates increases approaching the chemical boron content. Admittance spectroscopy results unveil the presence of shallow boron acceptors and deep-level defects with levels in lower half of the bandgap. After the 1400 °C annealing, the boron acceptor still remains strongly compensated at room temperature by deep donor-like levels located close to mid-gap. However, the latter decrease in concentration with increasing annealing temperature and after 1700 °C, the boron acceptor is essentially uncompensated. Hence, the deep donors are decisive for the semi-insulating properties of the substrates, and their thermal evolution limits the thermal budget for device processing. The origin of the deep donors is not well-established, but substantial evidence supporting an assignment to carbon vacancies is presented.

  8. EL2 and related defects in GaAs - Challenges and pitfalls. [microdefect introducing a deep donor level

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.; Lagowski, J.

    1985-01-01

    The incorporation process of nonequilibrium vacancies in melt-grown GaAs is strongly complicated by deviations from stoichiometry and the presence of two sublattices. Many of the microdefects originating in these vacancies and their interactions introduce energy levels (shallow and deep) within the energy gap. The direct identification of the chemical or structural signature of these defects and its direct correlation to their electronic behavior is not generally possible. It is necessary, therefore, to rely on indirect methods and phenomenological models and deal with the associated pitfalls. EL2, a microdefect introducing a deep donor level, has been in the limelight in recent years because it is believed to be responsible for the semi-insulating behavior of undoped GaAs. Although much progress has been made towards understanding its origin and nature, some relevant questions remain unanswered. An attempt is made to assess the present status of understanding of EL2 in the light of most recent results.

  9. CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES: Transient surface photoconductivity of GaAs emitter studied by terahertz pump-emission spectroscopy

    NASA Astrophysics Data System (ADS)

    Shi, Yu-Lei; Zhou, Qing-Li; Zhang, Cun-Lin

    2009-10-01

    This paper investigates the ultrafast carrier dynamics and surface photoconductivity of unbiased semi-insulating GaAs in detail by using a terahertz pump-emission technique. Based on theoretical modelling, it finds that transient photoconductivity plays a very important role in the temporal waveform of terahertz radiation pulse. Anomalous enhancement in both terahertz radiation and transient photoconductivity is observed after the excitation of pump pulse and we attribute these phenomena to carrier capture in the EL2 centers. Moreover, the pump power- and temperature-dependent measurements are also performed to verify this trapping model.

  10. The electrical properties of 60 keV zinc ions implanted into semi-insulating gallium arsenide

    NASA Technical Reports Server (NTRS)

    Littlejohn, M. A.; Anikara, R.

    1972-01-01

    The electrical behavior of zinc ions implanted into chromium-doped semiinsulating gallium arsenide was investigated by measurements of the sheet resistivity and Hall effect. Room temperature implantations were performed using fluence values from 10 to the 12th to 10 to the 15th power/sq cm at 60 keV. The samples were annealed for 30 minutes in a nitrogen atmosphere up to 800 C in steps of 200 C and the effect of this annealing on the Hall effect and sheet resistivity was studied at room temperature using the Van der Pauw technique. The temperature dependence of sheet resistivity and mobility was measured from liquid nitrogen temperature to room temperature. Finally, a measurement of the implanted profile was obtained using a layer removal technique combined with the Hall effect and sheet resistivity measurements.

  11. Deep levels in undoped horizontal Bridgman GaAs by Fourier transform photoconductivity and Hall effect

    NASA Astrophysics Data System (ADS)

    Mitchel, W. C.; Brown, Gail J.; Rea, Laura S.; Smith, S. R.

    1992-01-01

    Deep levels between 0.1 and 1.0 eV in semi-insulating and high resistivity undoped horizontal Bridgman GaAs have been studied by temperature-dependent Hall effect (TDH) and Fourier transform photoconductivity (FTPC). Activation energies at 0.77, 0.426, and 0.15 eV have been observed by TDH. Photoionization thresholds at 1.0, 0.8, 0.56, 0.44, and 0.25 are reported. The photoconductivity thresholds at 0.56 and 0.25 eV are reported for the first time. New features in the 0.44 eV threshold suggest that the defect responsible for this level has a small lattice relaxation and Frank-Condon shift. Possible associations of the FTPC and TDH energies with the deep-level transient spectroscopy levels EL2, EL3, and EL6 are presented.

  12. Modification of GaAs surface by low-current Townsend discharge

    NASA Astrophysics Data System (ADS)

    Gurevich, E. L.; Kittel, S.; Hergenröder, R.; Astrov, Yu A.; Portsel, L. M.; Lodygin, A. N.; Tolmachev, V. A.; Ankudinov, A. V.

    2010-07-01

    The influence of stationary spatially homogeneous Townsend discharge on the (1 0 0) surface of semi-insulating GaAs samples is studied. Samples exposed to both electrons and ions in a nitrogen discharge at a current density j = 60 µA cm-2 are studied by means of x-ray photoelectron spectroscopy, ellipsometry and atomic force microscopy. It is shown that an exposure to low-energy ions (<1 eV) changes the crystal structure of the semiconductor for a depth of up to 10-20 nm, although the stoichiometric composition does not change. The exposure to low-energy electrons (<10 eV) forms an oxide layer, which is 5-10 nm thick. Atomic force microscopy demonstrates that the change in the surface potential of the samples may exceed 100 mV, for both discharge polarities, while the surface roughness does not increase.

  13. Deep levels induced by high fluence proton irradiation in undoped GaAs diodes

    SciTech Connect

    Castaldini, A.; Cavallini, A.; Polenta, L.; Canali, C.; Nava, F.; Ferrini, R.; Galli, M.

    1998-12-31

    Semi-insulating liquid encapsulated Czochralski grown GaAs has been investigated after irradiation at high fluences of high-energy protons. Electron beam induced current observations of scanning electron microscopy evidenced a radiation stimulated ordering. An analysis has been carried out of the deep levels associated with defects as a function of the irradiation fluence, using complementary current transient spectroscopies. By increasing the irradiation fluence, the concentration of the native traps at 0.37 eV together with that of the EL2 defect significantly increases and, at the same time, two new electron traps at 0.15 eV and 0.18 eV arise and quickly increase in density.

  14. GaAs core--shell nanowires for photovoltaic applications.

    PubMed

    Czaban, Josef A; Thompson, David A; LaPierre, Ray R

    2009-01-01

    We report the use of Te as an n-type dopant in GaAs core-shell p-n junction nanowires for use in photovoltaic devices. Te produced significant change in the morphology of GaAs nanowires grown by the vapor-liquid-solid process in a molecular beam epitaxy system. The increase in radial growth of nanowires due to the surfactant effect of Te had a significant impact on the operating characteristics of photovoltaic devices. A decrease in solar cell efficiency occurred when the Te-doped GaAs growth duration was increased.

  15. Nondestructive three-dimensional observation of defects in semi-insulating 6H-SiC single-crystal wafers using a scanning laser microscope (SLM) and infrared light-scattering tomography (IR-LST)

    NASA Astrophysics Data System (ADS)

    Wutimakun, Passapong; Buteprongjit, Chumpol; Morimoto, Jun

    2009-07-01

    Peripheral and central areas of a semi-insulating 6H-SiC single-crystal wafer were examined using a scanning laser microscope (SLM) and infrared light-scattering tomography (IR-LST). The form and density of the defects in each area were observed by SLM. We reconstructed three-dimensional (3D) IR-LST images of scatterers by stacking 2D layer-by-layer IR-LST images on different planes. Using these 3D IR-LST images, variations in the defect distribution with depth were observed for the first time. To study the defect distribution and defect form in detail, we observed the defect configuration in the same volume as for 3D IR-LST images by magnified SLM and merged the images from the two techniques. Information on defects obtained using this approach will be very important in the development of high-quality semi-insulating silicon carbide (SiC) substrates.

  16. The effect of the intense laser field on the electronic states and optical properties of n-type double δ-doped GaAs quantum wells

    NASA Astrophysics Data System (ADS)

    Kasapoglu, E.; Yesilgul, U.; Ungan, F.; Sökmen, I.; Sari, H.

    2017-02-01

    In this work, within the effective mass approximation we have performed a theoretical study of electronic states, the intersubband-related optical absorption coefficient and relative refractive index change properties in the GaAs-based double δ-doped quantum well under non-resonant intense laser field. By solving the Schrödinger equation in the laser-dressed confinement potential, we calculated eigenvalues and corresponding eigenfunctions as an intense laser parameter. We concluded that the separation between ground and first excited energy levels in the double δ-doped quantum well increases in energy by the increase of the laser field intensity and this effect leads to an optical blue-shift in intersubband transitions. Therefore a significant tunability of the optical transitions in double δ-doped quantum well can be achieved by modulating the intensity of the intense laser field.

  17. Self-compensation limited conductivity in semi-insulating indium-doped Cd0.9Zn0.1Te crystals

    NASA Astrophysics Data System (ADS)

    Kosyachenko, L. A.; Melnychuk, S. V.; Maslyanchuk, O. L.; Sklyarchuk, V. M.; Sklyarchuk, O. F.; Fiederle, M.; Lambropoulos, C. P.

    2012-07-01

    Cd0.9Zn0.1Te:In crystals with semi-intrinsic conductivity have been investigated. Temperature dependence of their electrical characteristics shows a number of unconventional peculiarities: the thermal activation energy of conductivity is "anomalously" low (0.60-0.62 eV); the resistivity at elevated temperatures is greater than its intrinsic value for Cd0.9Zn0.1Te; the inversion of the conduction from n- to p-type occurs at a temperature slightly above 300 K, etc. The observed features are explained in terms of statistics of electrons and holes in a semiconductor containing a self-compensation complex, whose concentration is much higher than those of uncontrolled (background) impurities and defects. Comparison of the calculation results and experimental data leads to the conclusion that the donor level, which is far distant from the middle of the band gap, dominates in the conductivity of the material and its compensation is virtually complete (Na/Nd = 0.99996-0.99998) as predicted by theory.

  18. Identification of As-vacancy complexes in Zn-diffused GaAs

    SciTech Connect

    Elsayed, M.; Krause-Rehberg, R.; Korff, B.; Richter, S.; Leipner, H. S.

    2013-03-07

    We have used positron annihilation spectroscopy to study the introduction of point defects in Zn-diffused semi-insulating GaAs. The diffusion was performed by annealing the samples for 2 h at 950 Degree-Sign C. The samples were etched in steps of 7 {mu}m. Both Doppler broadening using slow positron beam and lifetime spectroscopy studies were performed after each etching step. Both techniques showed the existence of vacancy-type defects in a layer of about 45 {mu}m. Secondary ion mass spectroscopy measurements illustrated the presence of Zn at high level in the sample almost up to the same depth. Vacancy-like defects as well as shallow positron traps were observed by lifetime measurements. We distinguish two kinds of defects: As vacancy belongs to defect complex, bound to most likely one Zn atom incorporated on Ga sublattice, and negative-ion-type positron traps. Zn acceptors explained the observation of shallow traps. The effect of Zn was evidenced by probing GaAs samples annealed under similar conditions but without Zn treatment. A defect-free bulk lifetime value is detected in this sample. Moreover, our positron annihilation spectroscopy measurements demonstrate that Zn diffusion in GaAs system is governed by kick-out mechanism.

  19. Origin and reduction of impurities at GaAs epitaxial layer-substrate interfaces

    NASA Astrophysics Data System (ADS)

    Kanber, H.; Yang, H. T.; Zielinski, T.; Whelan, J. M.

    1988-09-01

    Surface cleaning techniques used for semi-insulating GaAs substrates prior to epitaxial growth can have an important and sometimes detrimental effect on the quality and characteristics of epitaxial layers that are grown on them. We observe that a HF rinse followed by a 5:1:1 H 2SO 4:H 2O 2:H 2O etch and H 2O rinse drastically reduced the maximum concentrations and total amount of both SIMS detected S and Si for MOCVD grown GaAs undoped epitaxial layers. Subsequent final HCl and H 2O reduced the S interfacial residues to the SIMS detection limit. Total amounts of residual Si are estimated to be equivalent to 10 -2 to 10 -3 monolayers. Residual S is less. Alternately the S residue can be comparable reduced by a HF rinse followed by a NH 4OH:H 2O 2:H 2O etch and H 2O rinse. Hot aqueous HCl removes S but not Si residues. The Si residue is not electrically active and most likely exists as islands of SiO 2. The relative significance of the impurity residues is most pronounced for halide VPE, smaller for MBE and least for MOCVD grown GaAs epitaxial layers.

  20. X-ray imaging using a 320 x 240 hybrid GaAs pixel detector

    SciTech Connect

    Irsigler, R.; Andersson, J.; Alverbro, J.

    1999-06-01

    The authors present room temperature measurements on 200 {micro}m thick GaAs pixel detectors, which were hybridized to silicon readout circuits. The whole detector array contains 320 x 240 square shaped pixel with a pitch of 38 {micro}m and is based on semi-insulating liquid-encapsulated Czochralski (LEC) GaAs material. After fabricating and dicing, the detector chips were indium bump flip chip bonded to CMOS readout circuits based on charge integration and finally evaluated. This readout chip was originally designed for the readout of flip chip bonded infrared detectors, but appears to be suitable for X-ray applications as well. A bias voltage between 50 V and 100 V was sufficient to operate the detector at room temperature. The detector array did respond to x-ray radiation by an increase in current due to production of electron hole pairs by the ionization processes. Images of various objects and slit patterns were acquired by using a standard X-ray source for dental imaging. The new X-ray hybrid detector was analyzed with respect to its imaging properties. Due to the high absorption coefficient for X-rays in GaAs and the small pixel size, the sensor shows a high modulation transfer function up to the Nyquist frequency.

  1. Photoluminescence properties of modulation-doped In{sub x}Al{sub 1–x}As/In{sub y}Ga{sub 1–y}As/In{sub x}Al{sub 1–x}As structures with strained inas and gaas nanoinserts in the quantum well

    SciTech Connect

    Galiev, G. B.; Vasil’evskii, I. S.; Klimov, E. A.; Klochkov, A. N.; Lavruhin, D. V.; Pushkarev, S. S.; Maltsev, P. P.

    2015-09-15

    The photoluminescence spectra of modulation-doped InAlAs/InGaAs/InAlAs heterostructures with quantum wells containing thin strained InAs and GaAs inserts are investigated. It is established that the insertion of pair InAs layers and/ or a GaAs transition barriers with a thickness of 1 nm into a quantum well leads to a change in the form and energy position of the photoluminescence spectra as compared with a uniform In{sub 0.53}Ga{sub 0.47}As quantum well. Simulation of the band structure shows that this change is caused by a variation in the energy and wave functions of holes. It is demonstrated that the use of InAs inserts leads to the localization of heavy holes near the InAs layers and reduces the energy of optical transitions, while the use of GaAs transition barriers can lead to inversion of the positions of the light- and heavy-hole subbands in the quantum well. A technique for separately controlling the light- and heavy-hole states by varying the thickness and position of the GaAs and InAs inserts in the quantum well is suggested.

  2. Effect of the Photoquenching of EL2 in GaAs Substrate on the Piezoelectric Photothermal and Surface Photovoltage Spectra of a GaAs Single Quantum Well Confined by GaAs/AlAs Short-Period Superlattices

    NASA Astrophysics Data System (ADS)

    Wang, Ping; Fukuyama, Atsuhiko; Akashi, Yoshito; Ikari, Tetsuo

    2008-01-01

    Two nondestructive techniques, surface photovoltage (SPV) and piezoelectric photothermal (PPT) spectroscopies, were adopted to investigate a GaAs single quantum well (SQW) confined by GaAs/AlAs short-period superlattices (SPSs) fabricated on a semi-insulating (SI) GaAs substrate, whose absorption spectra cannot be obtained easily using conventional techniques. Excitonic absorptions associated with subband transitions in a GaAs SQW and SPSs were clearly observed. We also examined how a SI-GaAs substrate affects the PPT and SPV spectra, particularly the effect of the photoquenching of the deep donor level EL2. It was found that the photoquenching of EL2 causes a significant change in the total built-in potential at the interface between the epitaxial layers and the substrate, and affected the signal intensities observed in the PPT and SPV spectra. The present experimental results have shown that a large amount of carrier leakage occurs from a GaAs SQW and SPSs to the sample surface, even in the presence of Al0.3Ga0.7As buffer layers.

  3. ZnSe Window Layers for GaAs and GaInP2 Solar Cells

    NASA Technical Reports Server (NTRS)

    Olsen, Larry C.

    1995-01-01

    This report concerns studies of the use of ZnSe as a window layer for GaAs solar cells. Well-oriented crystalline ZnSe films on (100) single crystal GaAs substrates were grown by MOCVD. In particular, ZnSe films were grown by reacting a zinc adduct with hydrogen selenide at temperatures in the range of 200 C to 400 C. X-ray diffraction studies and images obtained with an atomic force microscope determined that the films were highly oriented but were polycrystalline. Particular emphasis was placed on the use of a substrate temperature of 350 C. Using iodine as a dopant, n-type ZnSe films with resistivities in the range of .01 to .05 ohm-cm were grown on semi-insulating GaAs. Thus procedures have been developed for investigating the utility of n-type ZnSe window layers on n/p GaAs structures. Studies of recombination at n-ZnSe/n-GaAs interfaces in n-ZnSe/n-GaAs/p-GaAs cell structures are planned for future work.

  4. LSI/VLSI (Large Scale Integration/Very Large Scale Integration) ion implanted GaAs (Gallium Arsenide) IC processing

    NASA Astrophysics Data System (ADS)

    Zucca, R. R.; Kirkpatrick, C. G.; Asbeck, P. M.; Eisen, F. H.; Lee, C. P.

    1984-01-01

    This report covers a program designed to realize the full potential of GaAs integrated circuits by expanding and improving fabrication and material techniques. The main accomplishment of the program was the successful implementation of the fabrication of integrated circuits on 3-inch diameter GaAs wafers. In addition, this program covered many activities related to GaAs IC processing. These include: work on semi-insulating material growth and characterization, investigation of ion implantation techniques (work carried out at the California Institute of Technology); evaluation of device uniformity, and investigation of its controlling factors; investigation of metallization yield and reliability, and improvements of processing techniques resulting from this study; design and testing of a multiplier and programmable shift registers/pattern generators; evaluation of mask programmable logic arrays to meet ERADCOMs needs for high performance communication systems; investigation of the hardness of GaAs ICs to total dose and transient ionizing radiation, and modelling of MESFET devices (this work carried out at North Carolina State University).

  5. Isoelectronic co-doping

    DOEpatents

    Mascarenhas, Angelo

    2004-11-09

    Isoelectronic co-doping of semiconductor compounds and alloys with deep acceptors and deep donors is used to decrease bandgap, to increase concentration of the dopant constituents in the resulting alloys, and to increase carrier mobilities lifetimes. Group III-V compounds and alloys, such as GaAs and GaP, are isoelectronically co-doped with, for example, N and Bi, to customize solar cells, thermal voltaic cells, light emitting diodes, photodetectors, and lasers on GaP, InP, GaAs, Ge, and Si substrates. Isoelectronically co-doped Group II-VI compounds and alloys are also included.

  6. Comparison of semi-insulating InAlAs and InP:Fe for InP-based buried-heterostructure QCLs

    NASA Astrophysics Data System (ADS)

    Flores, Y. V.; Aleksandrova, A.; Elagin, M.; Kischkat, J.; Kurlov, S. S.; Monastyrskyi, G.; Hellemann, J.; Golovynskyi, S. L.; Dacenko, O. I.; Kondratenko, S. V.; Tarasov, G. G.; Semtsiv, M. P.; Masselink, W. T.

    2015-09-01

    In a previous work [Flores et al., J. Cryst. Growth 398 (2014) 40] [3] we demonstrated the advantages of using a thin InAlAs spacer layer in the fabrication of buried-heterostructure quantum-cascade lasers (QCLs), as it improves the morphology of the interface between the laser core and the InP:Fe lateral cladding. In this paper we investigate aspects of InAlAs, which are relevant for its role as insulating lateral cladding of the laser sidewalls: carrier traps, electrical resistivity, and functionality as a sole lateral cladding. We find that a thin InAlAs spacer layer not only improves the regrowth interface morphology, but also eliminates interface-related shallow electronic states, thus improving the electrical resistivity of the interface. We further find that bulk InAlAs grown by gas-source molecular-beam epitaxy as well as InP:Fe are semi-insulating at room temperature, with specific resistivities of 3 ×107 Ω cm and 2 ×108 Ω cm, respectively. Both materials have also a high thermal activation energy for electrical conductivity (0.79 eV and 0.68 eV, respectively). In order to compare the performance of InP:Fe and InAlAs as a lateral cladding, lasers were fabricated from the same QCL wafer with differing stripe insulation materials. The resulting lasers differ mainly by the lateral insulation material: SiO2, InP:Fe (with InAlAs spacer), and pure InAlAs. All devices show a similar performance and similar temperature dependence, indicating insulating properties of InAlAs adequate for application in lateral regrowth of buried-heterostructure QCLs.

  7. Migration processes of the As interstitial in GaAs

    NASA Astrophysics Data System (ADS)

    Wright, A. F.; Modine, N. A.

    2016-12-01

    Thermal migration processes of the As interstitial in GaAs were investigated using density-functional theory and the local-density approximation for exchange and correlation. The lowest-energy processes were found to involve the -1, 0, and +1 charge states, and to produce migration along ⟨110⟩-type directions. In the -1 and 0 charge states, migration proceeds via hops between split-interstitial stable configurations at bulk As sites through bridging saddle-point configurations in which the interstitial atom is equidistant from two adjacent bulk As sites. In the +1 charge state, the roles of these two configurations are approximately reversed and migration proceeds via hops between bridging stable configurations through higher-energy split-interstitial stable configurations bounded by a pair of distorted split-interstitial saddle-point configurations. The predicted activation energies for migration in the 0 and +1 charge states agree well with measurements in semi-insulating and p-type material, respectively. Also consistent with experiments, the approximate reversal of the stable and saddle-point configurations between the 0 and +1 charge states is predicted to enable carrier-induced migration with a residual activation energy of 0.05 eV.

  8. Intense laser field effects on the intersubband optical absorption and refractive index change in the δ -doped GaAs quantum wells

    NASA Astrophysics Data System (ADS)

    Sari, H.; Yesilgul, U.; Ungan, F.; Sakiroglu, S.; Kasapoglu, E.; Sökmen, I.

    2017-04-01

    In this paper, we have investigated the effects of the non-resonant intense laser field on the electronic and optical properties such as linear, nonlinear and the total optical absorption coefficient and refractive index change for transitions between two lower-lying electronic states in the GaAs-based δ -doped quantum well. Within the effective mass approximation, we calculated the eigenvalues and corresponding eigenfunctions as a function of the intense laser parameter by solving the Schrödinger equation in the laser-dressed confinement potential. The analytical expressions of the linear and third-order non-linear optical absorption coefficients and refractive index changes are obtained by using the compact-density matrix formalism. The obtained results show that the separation between ground and first excited energy levels in the δ -doped quantum well decreases in energy by the increase of the laser field intensity and this effect leads to an optical red-shift in the intersubband transitions. This behavior gives us a new degree of freedom in tunability of different device applications based on the optical transitions.

  9. Electrodeposition of Metal on GaAs Nanowires

    NASA Astrophysics Data System (ADS)

    Liu, Chao; Einabad, Omid; Watkins, Simon; Kavanagh, Karen

    2010-10-01

    Copper (Cu) electrical contacts to freestanding gallium arsenide (GaAs) nanowires have been fabricated via electrodeposition. The nanowires are zincblende (111) oriented grown epitaxially on n-type Si-doped GaAs (111)B substrates by gold-catalyzed Vapor Liquid Solid (VLS) growth in a metal organic vapour phase epitaxy (MOVPE) reactor. The epitaxial electrodeposition process, based on previous work with bulk GaAs substrates, consists of a substrate oxide pre-etch in dilute ammonium-hydroxide carried out prior to galvanostatic electrodeposition in a pure Cu sulphate aqueous electrolyte at 20-60^oC. For GaAs nanowires, we find that Cu or Fe has a preference for growth on the gold catalyst avoiding the sidewalls. After removing gold, both metals still prefer to grow only on top of the nanowire, which has the largest potential field.

  10. THz conductivity of semi-insulating and magnetic CoFe2O4 nano-hollow structures through thermally activated polaron

    NASA Astrophysics Data System (ADS)

    Rakshit, Rupali; Serita, Kazunori; Tonouchi, Masayoshi; Mandal, Kalyan

    2016-11-01

    Herein, terahertz (THz) time domain spectroscopy is used to measure the complex conductivity of semi-insulating CoFe2O4 nanoparticles (NPs) and nano-hollow spheres (NHSs) with different diameters ranging from 100 to 350 nm having a nanocrystalline shell thickness of 19 to 90 nm, respectively. Interestingly, the magnitude of conductivity for CoFe2O4 NPs and NHSs of same average diameter (˜100 nm) for a given frequency of 0.3 THz is found to be 0.33 S/m and 9.08 S/m, respectively, indicating that the hollow structure exhibits greater THz conduction in comparison to its solid counterpart. Moreover, THz conductivity can be tailored by varying the nano-shell thickness of NHSs, and a maximum conductivity of 15.61 S/m is observed at 0.3 THz for NHSs of average diameter 250 nm. A detailed study reveals that thermally activated polaronic hopping plays the key role in determining the electrical transport property of CoFe2O4 nanostructures, which is found to solely depend on their magnitude of THz absorptivity. The non-Drude conductivity of all CoFe2O4 nanostructures is well described by the Polaron model instead of the Drude-Smith model, which is relevant for backscattering of free electrons in a nanostructured material. The Polaron model includes intra-particle and interparticle polaronic conductivities for closely spaced magnetic nanostructures and provides a mean free path of 29 nm for CoFe2O4 NPs of diameter 100 nm, which is comparable with its average crystallite size, indicating the applicability of the developed model for nanomaterials where charge transport is determined by polaronic hopping. Finally, we have demonstrated the morphology and size dependent magnetic measurements of ferrimagnetically aligned CoFe2O4 nanostructures through a vibrating sample magnetometer in the temperature range of 80-250 K, revealing that the disordered surface spin layer of nanostructures significantly controls their magnetism.

  11. Delta-doping of Semiconductors

    NASA Astrophysics Data System (ADS)

    Schubert, E. F.

    2005-08-01

    Part I: 1. Introduction E. F. Schubert; Part II: 2. Electronic structure of delta-doped semiconductors C. R. Proetto; Part III: 3. Recent progress in delta-like confinement of impurities in GaAs K. H. Ploog; 4. Flow-rate modulation epitaxy (FME) of III-V semiconductors T. Makimoto and Y. Horikoshi; 5. Gas source molecular beam epitaxy (MBE) of delta-doped III-V semiconductors D. Ritter; 6. Solid phase epitaxy for delta-doping in silicon I. Eisele; 7. Low temperature MBE of silicon H.-J. Gossmann; Part IV: 8. Secondary ion mass spectrometry of delta-doped semiconductors H. S. Luftmann; 9. Capacitance-voltage profiling E. F. Schubert; 10. Redistribution of impurities in III-V semiconductors E. F. Schubert; 11. Dopant diffusion and segregation in delta-doped silicon films H.-J. Gossmann; 12. Characterisation of silicon and delta-doped structures in GaAs R. C. Newman; 13. The DX-center in silicon delta-doped GaAs and AlxGa1-xAs P. M. Koenraad; Part V: 14. Luminescence and ellipsometry spectroscopy H. Yao and E. F. Schubert; 15. Photoluminescence and Raman spectroscopy of single delta-doped III-V semiconductor heterostructures J. Wagner and D. Richards; 16. Electron transport in delta-doped quantum wells W. T. Masselink; 17. Electron mobility in delta-doped layers P. M. Koenraad; 18. Hot electrons in delta-doped GaAs M. Asche; 19. Ordered delta-doping R. L. Headrick, L. C. Feldman and B. E. Weir; Part IV: 20. Delta-doped channel III-V field effect transistors (FETs) W.-P. Hong; 21. Selectively doped heterostructure devices E. F. Schubert; 22. Silicon atomic layer doping FET K. Nakagawa and K. Yamaguchi; 23. Planar doped barrier devices R. J. Malik; 24. Silicon interband and intersubband photodetectors I. Eisele; 25. Doping superlattice devices E. F. Schubert.

  12. Electrical properties of molecular beam epitaxial GaAs grown at 300-450{degrees}C

    SciTech Connect

    Look, D.C.; Robinson, G.D.; Sizelove, J.R.; Stutz, C.E.

    1993-12-01

    We use the Hall effect and a new charge-transfer technique to study molecular beam epitaxial GaAs grown at the low substrate temperatures of 300-450{degrees}C. Layers grown from 350-450{degrees}C are semi-insulating (resistivity greater than 10{sup 7}{Omega}-cm), as grown, because of an As{sub Ga}-related donor (not EL2) at E{sub c} - 0.65 eV. The donor concentrations are about 2 x 10{sup 18} cm{sup -3} and 2 x 10{sup 17} cm{sup -3} at growth temperatures of 300 and 400{degrees}C, respectively, and acceptor concentrations are about an order of magnitude lower. Relatively high mobilities ({approximately}5000 cm{sup 2}/V s) along with the high resistivities make this material potentially useful for certain device applications. 8 refs., 2 figs., 2 tabs.

  13. Modelling of OPNMR phenomena using photon energy-dependent in GaAs and InP

    NASA Astrophysics Data System (ADS)

    Wheeler, Dustin D.; Willmering, Matthew M.; Sesti, Erika L.; Pan, Xingyuan; Saha, Dipta; Stanton, Christopher J.; Hayes, Sophia E.

    2016-12-01

    We have modified the model for optically-pumped NMR (OPNMR) to incorporate a revised expression for the expectation value of the z-projection of the electron spin, and apply this model to both bulk GaAs and a new material, InP. This expression includes the photon energy dependence of the electron polarization when optically pumping direct-gap semiconductors in excess of the bandgap energy, Eg . Rather than using a fixed value arising from coefficients (the matrix elements) for the optical transitions at the k = 0 bandedge, we define a new parameter, Sopt (Eph) . Incorporating this revised element into the expression for , we have simulated the photon energy dependence of the OPNMR signals from bulk semi-insulating GaAs and semi-insulating InP. In earlier work, we matched calculations of electron spin polarization (alone) to features in a plot of OPNMR signal intensity versus photon energy for optical pumping (Ramaswamy et al., 2010). By incorporating an electron spin polarization which varies with pump wavelength into the penetration depth model of OPNMR signal, we are able to model features in both III-V semiconductors. The agreement between the OPNMR data and the corresponding model demonstrates that fluctuations in the OPNMR intensity have particular sensitivity to light hole-to-conduction band transitions in bulk systems. We provide detailed plots of the theoretical predictions for optical pumping transition probabilities with circularly-polarized light for both helicities of light, broken down into illustrative plots of optical magnetoabsorption and spin polarization, shown separately for heavy-hole and light-hole transitions. These plots serve as an effective roadmap of transitions, which are helpful to other researchers investigating optical pumping effects.

  14. First principles study of bismuth alloying effects in GaAs saturable absorber.

    PubMed

    Li, Dechun; Yang, Ming; Zhao, Shengzhi; Cai, Yongqing; Feng, Yuanping

    2012-05-07

    First principles hybrid functional calculations have been carried out to study electronic properties of GaAs with Bi alloying effects. It is found that the doping of Bi into GaAs reduces the bandgap due to the intraband level repulsions between Bi induced states and host states, and the Bi-related impurity states originate from the hybridization of Bi-6p and its nearest As-4p orbitals. With the increase of Bi concentration in GaAs, the bandgap decreases monotonously. The calculated optical properties of the undoped and Bi-doped GaAs are similar except the shift toward lower energy of absorption edge and main absorption peaks with Bi doping. These results suggest a promising application of GaBi(x)As(1-x) alloy as semiconductor saturable absorber in Q-switched or mode-locked laser.

  15. EL2 and related defects in GaAs - Challenges and pitfalls

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.; Lagowski, J.

    1985-01-01

    The incorporation process of nonequilibrium vacancies in melt-grown GaAs is strongly complicated by deviations from stoichiometry, and the presence of two sublattices. Many of the microdefects originating in these vacancies and their interactions introduce energy levels (shallow and deep) within the energy gap. The direct identification of the chemical or structural signature of these defects and its direct correlation to their electronic behavior is not generally possible. It is therefore necessary to rely on indirect methods and phenomenological models and be confronted with the associated pitfalls. EL2, a microdefect introducing a deep donor level, has been in the limelight in recent years because it is believed to be responsible for the semi-insulating behavior of undoped GaAs. Although much progress has been made towards understanding its origin and nature, some relevant questions remain unanswered. An attempt is made to assess the present status of understanding of EL2 in the light of the most recent results.

  16. Effects of EL2 deep level in GaAs photoconductive switch

    NASA Astrophysics Data System (ADS)

    Shi, Wei; Liu, Rui; Wang, Jing-li

    2009-07-01

    The semi-insulating (SI) GaAs photoconductive switch is considered to be the higher efficient THz source recently. In order to make good use of the photoconductive switch to generate the more efficient THz wave, SI-GaAs photoconductive switch's working mechanism is discussed from the respect of EL2 deep level in this paper. It has three operation modes. The SI-GaAs material has many kinds of intrinsic-defects. One of the more notable defects is EL2 deep level. The EL2 level can become an impactful electron trap in the linear operation mode; The EL2 level is also the necessary condition of nonlinear (also known as Lock-on) operation mode emerging in III-V semiconductors such as GaAs and InP. At the same time, the compound operation mode is substantial related with the conversion from neutral energy level EL20 to metastable energy level EL2* and singly ionized energy level EL2+ in semiconductor under the light. So in this paper the effects of EL2 deep level are analyzed in photoconductive switch' there operation modes.

  17. Graphitized carbon on GaAs(100) substrates

    SciTech Connect

    Simon, J.; Simmonds, P. J.; Lee, M. L.; Woodall, J. M.

    2011-02-14

    We report on the formation of graphitized carbon on GaAs(100) surfaces by molecular beam epitaxy. We grew highly carbon-doped GaAs on AlAs, which was then thermally etched in situ leaving behind carbon atoms on the surface. After thermal etching, Raman spectra revealed characteristic phonon modes for sp{sup 2}-bonded carbon, consistent with the formation of graphitic crystallites. We estimate that the graphitic crystallites are 1.5-3 nm in size and demonstrate that crystallite domain size can be increased through the use of higher etch temperatures.

  18. Method of Making Self-Aligned GAAS/ALGAAS FET’s.

    DTIC Science & Technology

    having a predetermined crystalline structure is obtained having a heavily doped top GaAs layer, having a heavily doped AlGaAs layer under the top layer...recess is wider at the base of the recess than at the top of the recess because of the predetermined crystalline structure and the orientation-dependent

  19. Electrical and structural characterization of GaAs on InP grown by OMCVD; application to GaAs MESFETs

    NASA Astrophysics Data System (ADS)

    Azoulay, R.; Clei, A.; Dugrand, L.; Draïdia, auN.; Leroux, G.; Biblemont, S.

    1991-01-01

    The growth of GaAs on InP has attracted considerable interest recently because of the possibility of integration of GaAs electronic devices and 1.3 μm optical devices on the same wafer. In this work, we have investigated the growth of GaAs MESFETs and doped channel MIS-like FETs on InP by atmospheric pressure OMCVD. Because of the difference between the thermal expansion coefficient of GaAs and InP, the layers are under biaxial strain. The lowest FWHM of the (004) reflection curve of the double crystal X-ray diffraction spectra is 110 arc sec for a 12 μm thick layer. We have investigated the influence of the substrate temperature and of the arsine molar fraction on the residual carrier concentration of layers grown side by side on GaAs and on InP. The GaAs layers grown on InP are much more compensated than the layers grown on GaAs, indicating a higher incorporation of impurities. On MESFETs grown on InP, gm = 200mS/mm with Fmax higher than 30 GHz. On doped-channel MIS-like FETs on InP, we have measured gm = 145mS/mm.

  20. Interface demarcation in GaAs by current pulsing

    NASA Technical Reports Server (NTRS)

    Matthiesen, D. H.; Kafalas, J. A.; Duchene, G. A.; Bellows, A. H.

    1990-01-01

    GTE Laboratories is currently conducting a program to investigate the effect of convection in the melt on the properties of bulk grown gallium arsenide (GaAs). In addition to extensive ground based experimentation, a Get Away Special growth system has been developed to grow two GaAs crystals aboard the Space Shuttle, each with a one inch diameter. In order to perform a complete segregation analysis of the crystals grown in space, it is necessary to measure the interface shape and growth rate as well as the spatial distribution of the selenium dopant. The techniques for interface demarcation in selenium doped GaAs by current pulsing have been developed at GTE Laboratories and successful interface demarcation has been achieved for current pulses ranging from 20 to 90 amps, in both single crystal and polycrystalline regions.

  1. Monolithic Series-Interconnected GaInAsSb/AlGaAsSb Thermophotovoltaic Devices Wafer Bonded to GaAs

    NASA Astrophysics Data System (ADS)

    Wang, C. A.; Huang, R. K.; Connors, M. K.; Shiau, D. A.; Murphy, P. G.; O'Brien, P. W.; Anderson, A. C.; Donetsky, D.; Anikeev, S.; Belenky, G.; Luryi, S.; Nichols, G.

    2004-11-01

    GaInAsSb/AlGaAsSb/GaSb epitaxial layers were wafer bonded to semi-insulating GaAs wafers for monolithic series interconnection of thermophotovoltaic (TPV) devices. SiOx/Ti/Au was used as a bonding layer to provide electrical isolation and to serve as an internal back-surface reflector (BSR). The minority-carrier lifetime in WB BSR structures is more than two times longer than that of control structures without a BSR. WB GaInAsSb/AlGaAsSb TPV cells were fabricated and monolithically interconnected in series. These cells exhibit nearly linear voltage building. At a short-circuit current density of 0.4 A/cm2, Voc of a single TPV cell is 0.2 V, compared to 0.37 and 1.8 V for 2- and 10-junction series-interconnected TPV cells, respectively.

  2. Neutron irradiation effects on the infrared absorption of the EL2 defect in GaAs: New interpretation for the intracenter transition

    SciTech Connect

    Manasreh, M.O.; Fischer, D.W.; Covington, B.C.

    1988-04-15

    The effect of neutron irradiation on the optical properties of the EL2 center in semi-insulating GaAs was studied using the infrared absorption technique. The results show that the absorption band known as the intracenter transition between 1.03 and 1.27 eV is decreased by neutron irradiation. This absorption band is interpreted as a charge-transfer transition between the As/sub Ga/ antisite and an X component(s) assuming that EL2equivalentAs/sub Ga/+X. The neutron irradiation increases the As/sub Ga/ antisite concentration and reduces the EL2 concentration. The reduction of the EL2 concentration is due to the decrease of the X-component concentration. The zero-phonon line observed at 1.039 eV may not be an internal optical excitation within the isolated As/sub Ga/ antisite.

  3. Ferromagnetic GaAs structures with single Mn delta-layer fabricated using laser deposition.

    PubMed

    Danilov, Yuri A; Vikhrova, Olga V; Kudrin, Alexey V; Zvonkov, Boris N

    2012-06-01

    The new technique combining metal-organic chemical vapor epitaxy with laser ablation of solid targets was used for fabrication of ferromagnetic GaAs structures with single Mn delta-doped layer. The structures demonstrated anomalous Hall effect, planar Hall effect, negative and anisotropic magnetoresistance in temperature range of 10-35 K. In GaAs structures with only single Mn delta-layer (without additional 2D hole gas channel or quantum well) ferromagnetism was observed for the first time.

  4. Modelling of OPNMR phenomena using photon energy-dependent 〈Sz〉 in GaAs and InP.

    PubMed

    Wheeler, Dustin D; Willmering, Matthew M; Sesti, Erika L; Pan, Xingyuan; Saha, Dipta; Stanton, Christopher J; Hayes, Sophia E

    2016-12-01

    We have modified the model for optically-pumped NMR (OPNMR) to incorporate a revised expression for the expectation value of the z-projection of the electron spin, 〈Sz〉 and apply this model to both bulk GaAs and a new material, InP. This expression includes the photon energy dependence of the electron polarization when optically pumping direct-gap semiconductors in excess of the bandgap energy, Eg. Rather than using a fixed value arising from coefficients (the matrix elements) for the optical transitions at the k=0 bandedge, we define a new parameter, Sopt(Eph). Incorporating this revised element into the expression for 〈Sz〉, we have simulated the photon energy dependence of the OPNMR signals from bulk semi-insulating GaAs and semi-insulating InP. In earlier work, we matched calculations of electron spin polarization (alone) to features in a plot of OPNMR signal intensity versus photon energy for optical pumping (Ramaswamy et al., 2010). By incorporating an electron spin polarization which varies with pump wavelength into the penetration depth model of OPNMR signal, we are able to model features in both III-V semiconductors. The agreement between the OPNMR data and the corresponding model demonstrates that fluctuations in the OPNMR intensity have particular sensitivity to light hole-to-conduction band transitions in bulk systems. We provide detailed plots of the theoretical predictions for optical pumping transition probabilities with circularly-polarized light for both helicities of light, broken down into illustrative plots of optical magnetoabsorption and spin polarization, shown separately for heavy-hole and light-hole transitions. These plots serve as an effective roadmap of transitions, which are helpful to other researchers investigating optical pumping effects.

  5. Two orders of magnitude reduction in the temperature dependent resistivity of Ga1-xMnxAs grown on (6 3 1) GaAs insulating substrates

    NASA Astrophysics Data System (ADS)

    Rangel-Kuopp, Victor-Tapio; Martinez-Velis, Isaac; Gallardo-Hernandez, Salvador; Lopez-Lopez, Maximo

    2013-12-01

    The temperature dependent van der Pauw (T-Pauw) technique was used to investigate the resistivity of three Ga1-xMnxAs layers grown on (6 3 1) GaAs semi-insulating substrates. The samples had Mn concentration of 3.52×l020 cm-3, 5.05×1020 cm-3 and 1.12×l021 cm-3, corresponding to Mn cell effusion temperature TMn of 700 °C, 715 °C and 745 °C, respectively. They were compared to samples grown under the same conditions but on (0 0 1) GaAs semi-insulating substrates. For the sample grown at TMn=700 °C on a (6 3 1) substrate, a two orders of magnitude decrease in the resistivity is observed, when compared with the sample grown on a (0 0 1) substrate. For the sample grown at TMn=715 °C the decrease is approximately four times, while for the sample grown at TMn=745 °C the decrease is approximately forty times. We plotted the resistivities as a function of temperature in Arrhenius plots, where we extracted two activation energies, the smallest one between 6 and 11 meV, and the largest one between 25 and 183 meV. Both activation energies increased as TMn increased. These results are in agreement with SIMS analysis where we observed that manganese concentration in the (6 3 1) orientation growth is around two order of magnitude larger than in the samples grown in the (0 0 1) orientation substrate.

  6. Incorporation of the dopants Si and Be into GaAs nanowires

    NASA Astrophysics Data System (ADS)

    Hilse, M.; Ramsteiner, M.; Breuer, S.; Geelhaar, L.; Riechert, H.

    2010-05-01

    We studied the doping with Si and Be of GaAs nanowires (NWRs) grown by molecular beam epitaxy. Regarding the NW morphology, no influence was observed for Si doping but high Be doping concentrations cause a kinking and tapering of the NWRs. We investigated local vibrational modes by means of resonant Raman scattering to determine the incorporation sites of the dopant atoms. For Si doping, both donors on Ga sites and acceptors on As sites have been observed. Be was found to be incorporated as an acceptor on Ga sites. However, at high doping concentration, Be is also incorporated on interstitial sites.

  7. Vacancy-associated Te sites in GaAs

    NASA Astrophysics Data System (ADS)

    Wuyts, K.; Langouche, G.; van Rossum, M.; Silverans, R. E.

    1992-03-01

    Defect structures, observed by 129I Mössbauer spectroscopy in high-dose Te-doped GaAs, are identified by a reference study of the semiconducting compound Ga2Te3. The formation of TeAs-VGa complexes (tellurium atoms quasisubstitutional on an As site with a gallium vacancy in the first-neighbor shell) is proposed, in agreement with theoretical predictions. The relevance of this assignment in relation to the earlier proposed Te DX configuration is also discussed.

  8. Localized corrosion of GaAs surfaces and formation of porous GaAs

    SciTech Connect

    Schmuki, P.; Vitus, C.M.; Isaacs, H.S.; Fraser, J.; Graham, M.J.

    1995-12-01

    The present work deals with pitting corrosion of p- and n-type GaAs (100). Pit growth can be electrochemically initiated on both conduction types in chloride-containing solutions and leads after extended periods of time to the formation of a porous GaAs structure. In the case of p-type material, localized corrosion is only observed if a passivating film is present on the surface, otherwise -- e.g. in acidic solutions -- the material suffers from a uniform attack (electropolishing) which is independent of the anion present. In contrast, pitting corrosion of n-type material can be triggered independent of the presence of an oxide film. This is explained in terms of the different current limiting factor for the differently doped materials (oxide film in the case of the p- and a space charge layer in the case of the n-GaAs). The porous structure was characterized by SEM, EDX and AES, and consists mainly of GaAs. From scratch experiments it is clear that the pit initiation process is strongly influenced by surface defects. For n-type material, AFM investigations show that light induced roughening of the order of several hundred nm occurs under non-passivating conditions. This nm- scale roughening however does not affect the pitting process.

  9. Characterization of Si volume- and delta-doped InGaAs grown by molecular beam epitaxy

    SciTech Connect

    Fedoryshyn, Y.; Kaspar, P.; Jaeckel, H.; Beck, M.

    2010-05-15

    Bulk InGaAs layers were grown at 400 deg. C lattice-matched to InP semi-insulating substrates by molecular beam epitaxy. Si doping of the layers was performed by applying volume- and delta-doping techniques. The samples were characterized by capacitance-voltage, van der Pauw-Hall, secondary ion mass spectroscopy and photoluminescence measurements. Good agreement in terms of dependence of mobility and Burstein-Moss shift shift on doping concentration in samples doped by the two different techniques was obtained. Amphoteric behavior of Si was observed at doping concentrations higher than {approx}2.9x10{sup 19} cm{sup -3} in both delta- and volume-doped samples. Degradation of InGaAs crystalline quality occurred in samples with Si concentrations higher than {approx}4x10{sup 19} cm{sup -3}.

  10. Heterostructure design optimization for laser cooling of GaAs

    NASA Astrophysics Data System (ADS)

    Imangholi, B.; Wang, C.; Soto, E.; Sheik-Bahae, M.; Stintz, A.; Malloy, K.; Nuntawong, N.; Epstein, R.

    2007-02-01

    Doping of the clad layers in thin GaAs/GaInP heterostructures, displaces the band energy discontinuity, modifies the carrier concentration in the active GaAs region and changes the quality of the hetero-interfaces. As a result, internal and consequently external quantum efficiencies in the double heterostructure are affected. In this paper, the interfacial quality of GaAs/GaInP heterostructure is systematically investigated by adjusting the doping level and type (n or p) of the cladding layer. An optimum structure for laser cooling applications is proposed.

  11. Breakover mechanism of GaAs photoconductive switch triggering spark gap for high power applications

    NASA Astrophysics Data System (ADS)

    Tian, Liqiang; Shi, Wei; Feng, Qingqing

    2011-11-01

    A spark gap (SG) triggered by a semi-insulating GaAs photoconductive semiconductor switch (PCSS) is presented. Currents as high as 5.6 kA have been generated using the combined switch, which is excited by a laser pulse with energy of 1.8 mJ and under a bias of 4 kV. Based on the transferred-electron effect and gas streamer theory, the breakover characteristics of the combined switch are analyzed. The photoexcited carrier density in the PCSS is calculated. The calculation and analysis indicate that the PCSS breakover is caused by nucleation of the photoactivated avalanching charge domain. It is shown that the high output current is generated by the discharge of a high-energy gas streamer induced by the strong local electric field distortion or by overvoltage of the SG resulting from quenching of the avalanching domain, and periodic oscillation of the current is caused by interaction between the gas streamer and the charge domain. The cycle of the current oscillation is determined by the rise time of the triggering electric pulse generated by the PCSS, the pulse transmission time between the PCSS and the SG, and the streamer transit time in the SG.

  12. Characterization of defect levels in semi-insulating 6H-SiC by means of photoinduced transient spectroscopy and modulated photocurrent technique.

    PubMed

    Longeaud, C; Kleider, J P; Kaminski, P; Kozlowski, R; Miczuga, M

    2009-01-28

    Parameters of electrically active defect centres in vanadium-doped 6H silicon carbide (6H-SiC:V) were investigated by means of the photoinduced transient spectroscopy (PITS) and modulated photocurrent (MPC) method. After a short description of the two techniques, experimental results are presented and briefly compared. Our aim is mainly to understand and explain these experimental results. In particular, in the PITS technique a shallow level seems to be at the origin of negative photoconductivity. Besides, in the same temperature range hole and electron levels can be detected at the same time. Finally, the detection of a given level seems to depend on the photon flux used to perform the PITS experiment. As far as the MPC experiment is concerned, it has put into evidence a very efficient shallow level. A numerical calculation was developed to simulate both experiments in order to understand the experimental results. By means of this simulation, we have explained all the phenomena observed experimentally in each technique and we propose a simple model for the distribution of electrically active defect centres in 6H-SiC:V crystals.

  13. Thermal conductivity of bulk GaN—Effects of oxygen, magnesium doping, and strain field compensation

    SciTech Connect

    Simon, Roland B.; Anaya, Julian; Kuball, Martin

    2014-11-17

    The effect of oxygen doping (n-type) and oxygen (O)-magnesium (Mg) co-doping (semi-insulating) on the thermal conductivity of ammonothermal bulk GaN was studied via 3-omega measurements and a modified Callaway model. Oxygen doping was shown to significantly reduce thermal conductivity, whereas O-Mg co-doped GaN exhibited a thermal conductivity close to that of undoped GaN. The latter was attributed to a decreased phonon scattering rate due the compensation of impurity-generated strain fields as a result of dopant-complex formation. The results have great implications for GaN electronic and optoelectronic device applications on bulk GaN substrates.

  14. Sidewall GaAs tunnel junctions fabricated using molecular layer epitaxy.

    PubMed

    Ohno, Takeo; Oyama, Yutaka

    2012-02-01

    In this article we review the fundamental properties and applications of sidewall GaAs tunnel junctions. Heavily impurity-doped GaAs epitaxial layers were prepared using molecular layer epitaxy (MLE), in which intermittent injections of precursors in ultrahigh vacuum were applied, and sidewall tunnel junctions were fabricated using a combination of device mesa wet etching of the GaAs MLE layer and low-temperature area-selective regrowth. The fabricated tunnel junctions on the GaAs sidewall with normal mesa orientation showed a record peak current density of 35 000 A cm(-2). They can potentially be used as terahertz devices such as a tunnel injection transit time effect diode or an ideal static induction transistor.

  15. Sidewall GaAs tunnel junctions fabricated using molecular layer epitaxy

    PubMed Central

    Ohno, Takeo; Oyama, Yutaka

    2012-01-01

    In this article we review the fundamental properties and applications of sidewall GaAs tunnel junctions. Heavily impurity-doped GaAs epitaxial layers were prepared using molecular layer epitaxy (MLE), in which intermittent injections of precursors in ultrahigh vacuum were applied, and sidewall tunnel junctions were fabricated using a combination of device mesa wet etching of the GaAs MLE layer and low-temperature area-selective regrowth. The fabricated tunnel junctions on the GaAs sidewall with normal mesa orientation showed a record peak current density of 35 000 A cm-2. They can potentially be used as terahertz devices such as a tunnel injection transit time effect diode or an ideal static induction transistor. PMID:27877466

  16. Microstructural properties of phosphorus-doped p-type ZnO grown by radio-frequency magnetron sputtering

    SciTech Connect

    Oh, Min-Suk; Hwang, Dae-Kue; Choi, Yong-Seok; Kang, Jang-Won; Park, Seong-Ju; Hwang, Chi-Sun; Cho, Kyoung Ik

    2008-09-15

    Phosphorus (P)-doped ZnO thin films were grown by radio-frequency magnetron sputtering to study the microstructural properties of p-type ZnO. As-grown P-doped ZnO, a semi-insulator, was converted to p-type ZnO after being annealed at 800 deg. C in an N{sub 2} ambient. X-ray diffraction, secondary-ion-mass spectrometry, and Hall effect measurements indicated that P{sub 2}O{sub 5} phases in as-grown P-doped ZnO disappeared after thermal annealing to form a substitutional P at an O lattice site, which acts as an acceptor in P-doped ZnO. Transmission electron microscopy showed that the formation of stacking faults was facilitated to release the strain in P-doped ZnO during post-thermal annealing.

  17. Experimental studies of the charge limit phenomenon in NEA GaAs photocathodes

    SciTech Connect

    Tang, H.; Alley, R.K.; Aoyagi, H.; Clendenin, J.E.; Frisch, J.C.; Mulhollan, G.A.; Saez, P.J.; Schultz, D.C.; Turner, J.L.

    1994-06-01

    Negative electron affinity GaAs photocathodes have been in continuous use at SLAC for generating polarized electron beams since early 1992. If the quantum efficiency of a GaAs cathode is below a critical value, the maximum photoemitted charge with photons of energies close to the band gap in a 2-ns pulse is found to be limited by the intrinsic properties of the cathode instead of by the space charge limit. We have studied this novel charge limit phenomenon in a variety of GaAs photocathodes of different structures and doping densities. We find that the charge limit is strongly dependent on the cathode`s quantum efficiency and the extraction electric field, and to a lesser degree on the excitation laser wavelength. In addition, we show that the temporal behavior of the charge limit depends critically on the doping density.

  18. Enhanced solar energy harvesting using top n-contact GaAs solar cell

    NASA Astrophysics Data System (ADS)

    Das, N. C.

    2015-05-01

    We fabricated single-junction solar cell on molecular beam epitaxially grown p-n junction on n-type gallium arsenide (GaAs) substrate. We used a germanium (Ge)/gold (Au)/nickel (Ni)/Au metal contact from the top side on a highly doped n+ epitaxial layer as well as the bottom side on an n-type GaAs substrate. We observed 10-15% increase in solar cell power when the top contact is used for the n+ GaAs epi layer compared to the bottom side n-type GaAs substrate. Solar cell fill factor, sheet, and shunt resistances are same for both the top and bottom contact type devices. We also observed higher external quantum efficiency (EQE) for top contact devices compared to bottom contact devices. We conclude that to achieve higher power, it is advantageous to use an n-type contact from a highly doped top n+ epitaxial layer rather than a bottom n-type GaAs substrate.

  19. GaAs Blocked-Impurity-Band Detectors for Far-Infrared Astronomy

    SciTech Connect

    Cardozo, Benjamin Lewin

    2004-01-01

    High-purity and doped GaAs films have been grown by Liquid-phase epitaxy (LPE) for development of a blocked impurity band (BIB) detector for far-infrared radiation. The film growth process developed has resulted in the capability to grow GaAs with a net active impurity concentration below 1 x 1013 cm-3, ideal for the blocking layer of the BIB detector. The growth of n-type LPE GaAs films with donor concentrations below the metal-insulator transition, as required for the absorbing layer of a BIB detector, has been achieved. The control of the donor concentration, however, was found to be insufficient for detector production. The growth by LPE of a high-purity film onto a commercially grown vapor-phase epitaxial (VPE) n-type GaAs doped absorbing layer resulted in a BIB device that showed a significant reduction in the low-temperature dark current compared to the absorbing layer only. Extended optical response was not detected, most likely due to the high compensation of the commercially grown GaAs absorbing layer, which restricts the depletion width of the device.

  20. Differences in stability and repeatability between GaAs and GaAlAs photocathodes

    NASA Astrophysics Data System (ADS)

    Xu, Yuan; Zhang, Yijun; Feng, Cheng; Shi, Feng; Zou, Jijun; Chen, Xinlong; Chang, Benkang

    2016-12-01

    For the applications in vacuum photodetectors and photoinjectors, a crucial limiting factor for conventional GaAs photocathodes is the limited lifetime, depending on the Cs-O activation layer vulnerable to the harmful residual gases. In order to develop a type of GaAs-based photocathode with good stability and repeatability, Cs/O activation and multiple recesiation experiments under the same preparation condition were performed on reflection-mode exponential-doped GaAs and GaAlAs photocathodes grown by metalorganic vapor phase epitaxy, and quantum efficiency and photocurrent decay were measured after activation and recesiation. The experimental results show that the photoemission characteristics on cathode degradation and repeatability are different between GaAs and GaAlAs photocathodes. In an unsatisfactory vacuum system, the operational lifetime for GaAlAs photocathode is nearly twice longer than that for GaAs photocathode after Cs/O activation under a high intensity illumination. After multiple recesiations, the quantum efficiency and operational lifetime for GaAlAs photocathode remain nearly unchanged, while those for GaAs photocathode become lower and lower with the increase of recesiation cycles, which reflects the superiority in stability and repeatability for GaAlAs photocathode in contrast to GaAs photocathode operating in the poor vacuum environment.

  1. Epitaxial two-dimensional nitrogen atomic sheet in GaAs

    SciTech Connect

    Harada, Yukihiro Yamamoto, Masuki; Baba, Takeshi; Kita, Takashi

    2014-01-27

    We have grown an epitaxial two-dimensional nitrogen (N) atomic sheet in GaAs by using the site-controlled N δ-doping technique. We observed a change of the electronic states in N δ-doped GaAs from the isolated impurity centers to the delocalized impurity band at 1.49 eV with increasing N-doping density. According to the excitation-power- and temperature-dependent photoluminescence (PL) spectra, the emission related to localized levels below the impurity band edge was dominant at low excitation power and temperature, whereas the effects of the localized levels can be neglected by increasing the excitation power and temperature. Furthermore, a clear Landau shift of the PL-peak energy was observed at several Tesla in the Faraday configuration, in contrast to the case in the impurity limit.

  2. Epitaxial two-dimensional nitrogen atomic sheet in GaAs

    NASA Astrophysics Data System (ADS)

    Harada, Yukihiro; Yamamoto, Masuki; Baba, Takeshi; Kita, Takashi

    2014-01-01

    We have grown an epitaxial two-dimensional nitrogen (N) atomic sheet in GaAs by using the site-controlled N δ-doping technique. We observed a change of the electronic states in N δ-doped GaAs from the isolated impurity centers to the delocalized impurity band at 1.49 eV with increasing N-doping density. According to the excitation-power- and temperature-dependent photoluminescence (PL) spectra, the emission related to localized levels below the impurity band edge was dominant at low excitation power and temperature, whereas the effects of the localized levels can be neglected by increasing the excitation power and temperature. Furthermore, a clear Landau shift of the PL-peak energy was observed at several Tesla in the Faraday configuration, in contrast to the case in the impurity limit.

  3. Lifetime measurements by open circuit voltage decay in GaAs and InP diodes

    NASA Technical Reports Server (NTRS)

    Bhimnathwala, H. G.; Tyagi, S. D.; Bothra, S.; Ghandhi, S. K.; Borrego, J. M.

    1990-01-01

    Minority carrier lifetimes in the base of solar cells made on GaAs and InP were measured by the open-circuit voltage decay method. The measurement technique and the conditions under which the minority carrier lifetimes can be measured are described. Minority carrier lifetimes ranging from 1.6 to 34 ns in InP of different doping concentrations were measured. A minority carrier lifetime of 6 ns was measured in n-type GaAs, which agrees well with the lifetime of 5.7 ns measured by transient microwave reflection.

  4. Influence of arsenic flow on the crystal structure of epitaxial GaAs grown at low temperatures on GaAs (100) and (111) A substrates

    NASA Astrophysics Data System (ADS)

    Galiev, G. B.; Klimov, E. A.; Vasiliev, A. L.; Imamov, R. M.; Pushkarev, S. S.; Trunkin, I. N.; Maltsev, P. P.

    2017-01-01

    The influence of arsenic flow in a growth chamber on the crystal structure of GaAs grown by molecular-beam epitaxy at a temperature of 240°C on GaAs (100) and (111) A substrates has been investigated. The flow ratio γ of arsenic As4 and gallium was varied in the range from 16 to 50. GaAs films were either undoped, or homogeneously doped with silicon, or contained three equidistantly spaced silicon δ-layers. The structural quality of the annealed samples has been investigated by transmission electron microscopy. It is established for the first time that silicon δ-layers in "low-temperature" GaAs serve as formation centers of arsenic precipitates. Their average size, concentration, and spatial distribution are estimated. The dependence of the film structural quality on γ is analyzed. Regions 100-150 nm in size have been revealed in some samples and identified (by X-ray microanalysis) as pores. It is found that, in the entire range of γ under consideration, GaAs films on (111) A substrates have a poorer structural quality and become polycrystalline beginning with a thickness of 150-200 nm.

  5. Transient Velocity Assessment in Gallium Arsenide, and of Other GaAs Characteristics Related to Device Functions

    DTIC Science & Technology

    2012-03-29

    GaAs, two-terminal devices such as N+N-N+ diodes, and three-terminal devices (such as MESFETs and bipolar transistors ) are treated. We have chosen...Cornell group is no longer working on the standard MESFET. Their planar-doped barrier transistor is a vertically oriented device that uses a barrier...made a few hundred angstroms thick. Figure 7 shows an energy diagram of the planar doped barrier transistor mentioned above. A second possibility

  6. Influence of SiCl sub 4 reactive ion etching on the electrical characteristics of GaAs

    SciTech Connect

    Lootens, D. , Laboratorium voor Elektromagnetisme en Acoustica , Sint-Pietersnieuwstraat 41, B-9000 Gent ); Clauws, P. ); Van Daele, P.; Demeester, P. , Laboratorium voor Elektromagnetisme en Acoustica , Sint-Pietersnieuwstraat 41, B-9000 Gent )

    1991-05-05

    SiCl{sub 4}-RIE causes electrical damage to GaAs strongly related to doping type and level. Changes in C-V and DLTS-measurements can be related to EL2-defects. Explanations for observed differences in n-type and p-type material will be presented.

  7. Spectroscopic constants and potential energy curves of GaAs, GaAs +, and GaAs -

    NASA Astrophysics Data System (ADS)

    Balasubramanian, K.

    1990-02-01

    Twenty electronic states of GaAs, 12 electronic states of GaAs +, and 13 electronic states of GaAs - are investigated using relativistic ab initio complete active space MCSCF (CASSCF) followed by large-scale configuration interaction calculations which included up to 700 000 configurations. Potential energy curves and spectroscopic constants of all these states of three radicals are obtained. Spectroscopic constants of low-lying states of GaAs are in very good agreement with both experiment and all-electron results. Two nearly-degenerate states of 2Σ +, 2Π ( 2Σ + lower) symmetries are found as candidates for the ground state of GaAs -. The GaAs - negative ion is found to be more stable compared to the neutral GaAs ( De(GaAs -) = 3 eV). The electron affinity of GaAs is computed as 0.89 and 1.3 eV at the FOCI and SOCI levels of theory, respectively. Calculated potential energy curves of GaAs are in accord with the experimentally observed predissociation in the 3Π( III) - X3Σ- system.

  8. Identification of oxygen-related midgap level in GaAs

    NASA Technical Reports Server (NTRS)

    Lagowski, J.; Lin, D. G.; Gatos, H. C.; Aoyama, T.

    1984-01-01

    An oxygen-related deep level ELO was identified in GaAs employing Bridgman-grown crystals with controlled oxygen doping. The activation energy of ELO is almost the same as that of the dominant midgap level: EL2. This fact impedes the identification of ELO by standard deep level transient spectroscopy. However, it was found that the electron capture cross section of ELO is about four times greater than that of EL2. This characteristic served as the basis for the separation and quantitative investigation of ELO employing detailed capacitance transient measurements in conjunction with reference measurements on crystals grown without oxygen doping and containing only EL2.

  9. Determination of carrier concentration and compensation microprofiles in GaAs

    NASA Technical Reports Server (NTRS)

    Jastrzebski, L.; Lagowski, J.; Walukiewicz, W.; Gatos, H. C.

    1980-01-01

    Simultaneous microprofiling of semiconductor free carrier, donor, and acceptor concentrations was achieved for the first time from the absolute value of the free carrier absorption coefficient and its wavelength dependence determined by IR absorption in a scanning mode. Employing Ge- and Si-doped melt-grown GaAs, striking differences were found between the variations of electron concentration and those of ionized impurity concentrations. These results showed clearly that the electronic characteristics of this material are controlled by amphoteric doping and deviations from stoichiometry rather than by impurity segregation.

  10. Comparison of degradation and recaesiation between GaAs and AlGaAs photocathodes in an unbaked vacuum system.

    PubMed

    Feng, Cheng; Zhang, Yijun; Shi, Feng; Qian, Yunsheng; Cheng, Hongchang; Zhang, Junju; Liu, Xinxin; Zhang, Xiang

    2017-03-20

    The lifetime and reliability of a photocathode during operation are always raised problems and the photocathode performance depends on the vacuum condition. With the purpose of investigating the stability and reliability of a GaAs-based photocathode in a harsher vacuum environment, reflection-mode exponential-doped GaAs and AlGaAs photocathodes are metalorganic vapor-phase epitaxial grown and then (Cs, O) activated inside an unbaked vacuum chamber. The degraded photocurrents are compared after activation and recaesiations between GaAs and AlGaAs photocathdoes under illumination with an equal initial photocurrent and an equal optical flux, respectively. It is found that the performance on degradation and recaesiations between GaAs and AlGaAs photocathodes are different. In the unbaked vacuum system, the stability of an AlGaAs photocathode after (Cs, O) activation is always better than that of a GaAs photocathode. After multiple recaesiations, the photocurrent decay curves of the AlGaAs photocathode are nearly coincident, which means a nearly constant operational lifetime. Moreover, operational lifetime of an AlGaAs photocathode is longer than that of a GaAs photocathode, which further illuminates that AlGaAs photocathodes are superior to GaAs photocathodes in stability and repeatability under markedly harsher vacuum conditions.

  11. GaAs solar cell development

    NASA Technical Reports Server (NTRS)

    Knechtli, R. C.; Kamath, S.; Loo, R.

    1977-01-01

    The motivation for developing GaAs solar cells is based on their superior efficiency when compared to silicon cells, their lower degradation with increasing temperature, and the expectation for better resistance to space radiation damage. The AMO efficiency of GaAs solar cells was calculated. A key consideration in the HRL technology is the production of GaAs cells of large area (greater than 4 sg cm) at a reasonable cost without sacrificing efficiency. An essential requirement for the successful fabrication of such cells is the ability to grow epitaxially a uniform layer of high quality GaAs (buffer layer) on state-of-the-art GaAs substrates, and to grow on this buffer layer the required than layer of (AlGa)As. A modified infinite melt liquid phase epitaxy (LPE) growth technique is detailed.

  12. Wafer Bonding and Epitaxial Transfer of GaSb-based Epitaxy to GaAs for Monolithic Interconnection of Thermophotovoltaic Devices

    SciTech Connect

    C.A. Wang; D.A. Shiau; P.G. Murphy; P.W. O'brien; R.K. Huang; M.K. Connors; A.C. Anderson; D. Donetsky; S. Anikeev; G. Belenky; D.M. Depoy; G. Nichols

    2003-06-16

    GaInAsSb/AlGaAsSb/InAsSb/GaSb epitaxial layers were bonded to semi-insulating GaAs handle wafers with SiO{sub x}/Ti/Au as the adhesion layer for monolithic interconnection of thermophotovoltaic (TPV) devices. Epitaxial transfer was completed by removal of the GaSb substrate, GaSb buffer, and InAsSb etch-stop layer by selective chemical etching. The SiO{sub x}/TiAu provides not only electrical isolation, but also high reflectivity and is used as an internal back-surface reflector. Characterization of wafer-bonded epitaxy by high-resolution x-ray diffraction and time-decay photoluminescence indicates minimal residual stress and enhancement in optical quality. 0.54-eV GaInAsSb cells were fabricated and monolithically interconnected in series. A 10-junction device exhibited linear voltage building with an open-circuit voltage of 1.8 V.

  13. Growth and characterization of Czochralski-grown n and p-type GaAs for space solar cell substrates

    NASA Technical Reports Server (NTRS)

    Chen, R. T.

    1983-01-01

    Progress in LEC (liquid encapsulated Czochralski) crystal growth techniques for producing high-quality, 3-inch-diameter, n- and p-type GaAs crystals suitable for solar cell applications is described. The LEC crystals with low dislocation densities and background impurities, high electrical mobilities, good dopant uniformity, and long diffusion lengths were reproducibly grown through control of the material synthesis, growth and doping conditions. The capability for producing these large-area, high-quality substrates should positively impact the manufacturability of highly efficiency, low cost, radiation-hard GaAs solar cells.

  14. GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Conway, E. J.

    1982-01-01

    The major thrusts proposed for GaAs were increased efficiency and improved radiation damage data. Current laboratory production cells consistently achieve 16 percent AMO one-Sun efficiency. The user community wants 18-percent efficient cells as soon as possible, and such a goal is though to be achievable in 2 years with sufficient research funds. A 20-percent research cell is considered the efficiency limit with current technology, and such a cell seems realizable in approximately 4 years. Future efficiency improvements await improved substrates and materials. For still higher efficiencies, concentrator cells and multijunction cells are proposed as near-term directions.

  15. Characterization of as-grown and annealed GaAs: Structural defects and electrical properties

    SciTech Connect

    Lee, B.T.

    1988-07-01

    Structural defects in GaAs related to excess As were characterized and their behavior upon heat treatments studied. The observed defects included precipitates and dislocations. Results showed most of the precipitates in As-rich GaAs to the rhombohedral arsenic. Two exceptions were observed in an In-doped LEC (liguid encapsulated Czochralski) GaAs, which were As-rich but could not be further identified. Some of the observed As precipitates showed a simple orientation relationship with the matrix which yields structural coherence between As precipitates and GaAs matrix. Other As precipitates showed less coherent orientation. The dislocation loops in As-rich GaAs consisted a faulted loop with Shockley type Burgers vector and a perfect loop associated with an extra /l brace/111/r brace/ plane. It was proposed that these loops were formed as a result of dual condensation of both excess As interstitials and Ga vacancies, followed by generation and movement of Shockley partial dislocations. These precipitates and dislocation loops disappear after annealing, indicating a solvus temperature between 600--700/degree/C. The EL2 concentration increased as the defects dissolved, showing the defects to be the source of the excess As required to form EL2. The implication is that the As interstitial and Ga vacancies coexist in GaAs at high temperatures, which indicates that these point defects are responsible for the formation of arsenic antisites by direct combination. During the cooling period, they freeze into the matrix as point defects during a rapid cooling and condense as dislocation loops and precipitates during very slow cooling, in the dislocation-free region of the crystals. Around dislocations, the excess As precipitates heterogeneously even during rapid cooling. 217 refs.

  16. Radiation effects in GaAs AMOS solar cells

    NASA Technical Reports Server (NTRS)

    Shin, B. K.; Stirn, R. J.

    1979-01-01

    The results of radiation damage produced in AMOS (Antireflecting-Metal-Oxide-Semiconductor) cells with Sb2O3 interfacial oxide layers by 1-MeV electrons are presented. The degradation properties of the cells as a function of irradiation fluences were correlated with the changes in their spectral response, C-V, dark forward, and light I-V characteristics. The active n-type GaAs layers were grown by the OM-CVD technique, using sulfur doping in the range between 3 x 10 to the 15th power and 7 x 10 to the 16th power/cu cm. At a fluence of 10 to the 16th power e/sq cm, the low-doped samples showed I sub sc degradation of 8% and V sub oc degradation of 8%. The high-doped samples showed I sub sc and V sub oc degradation of 32% and 1%, respectively, while the fill factor remained relatively unchanged for both. AMOS cells with water vapor-grown interfacial layers showed no significant change in V sub oc.

  17. Sn nanothreads in GaAs: experiment and simulation

    NASA Astrophysics Data System (ADS)

    Semenikhin, I.; Vyurkov, V.; Bugaev, A.; Khabibullin, R.; Ponomarev, D.; Yachmenev, A.; Maltsev, P.; Ryzhii, M.; Otsuji, T.; Ryzhii, V.

    2016-12-01

    The gated GaAs structures like the field-effect transistor with the array of the Sn nanothreads was fabricated via delta-doping of vicinal GaAs surface by Sn atoms with a subsequent regrowth. That results in the formation of the chains of Sn atoms at the terrace edges. Two device models were developed. The quantum model accounts for the quantization of the electron energy spectrum in the self-consistent two-dimensional electric potential, herewith the electron density distribution in nanothread arrays for different gate voltages is calculated. The classical model ignores the quantization and electrons are distributed in space according to 3D density of states and Fermi-Dirac statistics. It turned out that qualitatively both models demonstrate similar behavior, nevertheless, the classical one is in better quantitative agreement with experimental data. Plausibly, the quantization could be ignored because Sn atoms are randomly placed along the thread axis. The terahertz hot-electron bolometers (HEBs) could be based on the structure under consideration.

  18. Bismuth alloying properties in GaAs nanowires

    SciTech Connect

    Ding, Lu; Lu, Pengfei; Cao, Huawei; Cai, Ningning; Yu, Zhongyuan; Gao, Tao; Wang, Shumin

    2013-09-15

    First-principles calculations have been performed to investigate the structural, electronic and optical properties of bismuth alloying in GaAs nanowires. A typical model of Ga{sub 31}As{sub 31} nanowires is introduced for its reasonable band gap. The band gap of GaAs{sub 1−x}Bi{sub x} shrinks clearly with the increasing Bi concentration and the band edge shifts when spin–orbit coupling (SOC) is considered. The insertion of Bi atom leads to hybridization of Ga/As/Bi p states which contributes a lot around Fermi level. Scissor effect is involved. The optical properties are presented, including dielectric function, optical absorption spectra and reflectivity, which are also varied with the increasing of Bi concentrations. - Graphical abstract: Top view of Bi-doped GaAs nanowires. Ga, As, and Bi atoms are denoted with grey, purple and red balls, respectively. Display Omitted - Highlights: • A typical model of Ga{sub 31}As{sub 31} nanowires is introduced for its reasonable band gap. • The band gap of GaAs{sub 1−x}Bi{sub x} shrinks clearly with the increasing Bi concentration. • The band edge shifts when spin–orbit coupling (SOC) is considered. • The insertion of Bi atom leads to hybridization of Ga/As/Bi p states.

  19. Anisotropic transport in modulation doped quantum well structures

    NASA Technical Reports Server (NTRS)

    Radulescu, D. C.; Wicks, G. W.; Schaff, W. J.; Calawa, A. R.; Eastman, L. F.

    1987-01-01

    The degree of anisotropy in the anisotropic electron transport that has been observed in GaAs modulation-doped quantum wells grown by MBE on Al(0.3)Ga(0.7)As is related to the thickness and growth parameters of this substrate, which is grown just prior to the inverted interface. It is presently observed that the inverted interface has an anisotropic roughness which affects the 77 K low field electron transport parallel to the interface, and gives rise to anisotropic electron scattering in the GaAs modulation-doped quantum well.

  20. Patterned radial GaAs nanopillar solar cells.

    PubMed

    Mariani, Giacomo; Wong, Ping-Show; Katzenmeyer, Aaron M; Léonard, Francois; Shapiro, Joshua; Huffaker, Diana L

    2011-06-08

    Photovoltaic devices using GaAs nanopillar radial p-n junctions are demonstrated by means of catalyst-free selective-area metal-organic chemical vapor deposition. Dense, large-area, lithographically defined vertical arrays of nanowires with uniform spacing and dimensions allow for power conversion efficiencies for this material system of 2.54% (AM 1.5 G) and high rectification ratio of 213 (at ±1 V). The absence of metal catalyst contamination results in leakage currents of ∼236 nA at -1 V. High-resolution scanning photocurrent microscopy measurements reveal the independent functioning of each nanowire in the array with an individual peak photocurrent of ∼1 nA at 544 nm. External quantum efficiency shows that the photocarrier extraction highly depends on the degenerately doped transparent contact oxide. Two different top electrode schemes are adopted and characterized in terms of Hall, sheet resistance, and optical transmittance measurements.

  1. Ab Initio Investigation of the Structural, Electronic and Optical Properties of Cubic GaAs1- x P x Ternary Alloys Under Hydrostatic Pressure

    NASA Astrophysics Data System (ADS)

    Moussa, R.; Abdiche, A.; Abbar, B.; Guemou, M.; Riane, R.; Murtaza, G.; Omran, SAAD Bin; Khenata, R.; Soyalp, F.

    2015-12-01

    The structural, electronic and optical properties of the GaAs1- x P x ternary alloys together with their binary GaP and GaAs compounds were investigated in the zinc-blende (ZB) phase using the density functional theory. The lattice constant of the GaAs compound decreases while its bulk modulus increases when the doping concentration of the P dopant is increased. In addition, both parameters (lattice constant and bulk modulus) show small deviations from the linear concentration dependence. The energy band gap of the GaAs compound is of the direct nature, which increases with the increase in the P dopant concentration, whereas at higher P dopant concentration, the band gap shifts from direct to indirect character. On the other hand, the hydrostatic pressure has a significant effect on the band structure of the investigated compounds where the binary GaAs compound changes from a direct band gap semiconductor to an indirect band gap semiconductor at P ≥ 5 GPa. Furthermore, the pressure-dependence of the optical properties of the GaAs, GaP and GaAs0.75P0.25 alloy were also investigated, where the calculated zero frequency refractive index and the dielectric function are also compared with the experimental results as well as with different empirical models.

  2. Simulation of quantum dots size and spacing effect for intermediate band solar cell application based on InAs quantum dots arrangement in GaAs

    SciTech Connect

    Hendra, P. I. B. Rahayu, F. Darma, Y.

    2014-03-24

    Intermediate band solar cell (IBSC) has become a promising technology in increasing solar cell efficiency. In this work we compare absorption coefficient profile between InAs quantum dots with GaAs bulk. We calculate the efficiency of GaAs bulk and GaAs doped with 2, 5, and 10 nm InAs quantum dot. Effective distances in quantum dot arrangement based on electron tunneling consideration were also calculated. We presented a simple calculation method with low computing power demand. Results showed that arrangement of quantum dot InAs in GaAs can increase solar cell efficiency from 23.9 % initially up to 60.4%. The effective distance between two quantum dots was found 2 nm in order to give adequate distance to prevent electron tunneling and wave functions overlap.

  3. High-Performance GaAs Nanowire Solar Cells for Flexible and Transparent Photovoltaics.

    PubMed

    Han, Ning; Yang, Zai-xing; Wang, Fengyun; Dong, Guofa; Yip, SenPo; Liang, Xiaoguang; Hung, Tak Fu; Chen, Yunfa; Ho, Johnny C

    2015-09-16

    Among many available photovoltaic technologies at present, gallium arsenide (GaAs) is one of the recognized leaders for performance and reliability; however, it is still a great challenge to achieve cost-effective GaAs solar cells for smart systems such as transparent and flexible photovoltaics. In this study, highly crystalline long GaAs nanowires (NWs) with minimal crystal defects are synthesized economically by chemical vapor deposition and configured into novel Schottky photovoltaic structures by simply using asymmetric Au-Al contacts. Without any doping profiles such as p-n junction and complicated coaxial junction structures, the single NW Schottky device shows a record high apparent energy conversion efficiency of 16% under air mass 1.5 global illumination by normalizing to the projection area of the NW. The corresponding photovoltaic output can be further enhanced by connecting individual cells in series and in parallel as well as by fabricating NW array solar cells via contact printing showing an overall efficiency of 1.6%. Importantly, these Schottky cells can be easily integrated on the glass and plastic substrates for transparent and flexible photovoltaics, which explicitly demonstrate the outstanding versatility and promising perspective of these GaAs NW Schottky photovoltaics for next-generation smart solar energy harvesting devices.

  4. High Resistivity Molecular Beam Epitaxial AlGaAs for Device Applications.

    DTIC Science & Technology

    1980-02-01

    V MESFET technology requires, in part, the improvement of semi-insulating materials used in today’s device fabrication. The properties of currently...overall improvement in low temperature Hall mobility. Several techniques have been used to characterize AlGaAs properties. Basic determinations of impurity...available chromium-doped GaAs substrates impose restrictions on the performance of devices and monolithic circuits presently being produced in research

  5. High-efficiency, radiation-resistant GaAs space cells

    NASA Technical Reports Server (NTRS)

    Bertness, K. A.; Ristow, M. Ladle; Grounner, M.; Kuryla, M. S.; Werthen, J. G.

    1991-01-01

    Although many GaAs solar cells are intended for space applicatons, few measurements of cell degradation after radiation are available, particularly for cells with efficiencies exceeding 20 percent (one-sun, AMO). Often the cell performance is optimized for the highest beginning-of-life (BOL) efficiency, despite the unknown effect of such design on end-of-life (EOL) efficiencies. The results of a study of the radiation effects on p-n GaAs cells are presented. The EOL efficiency of GaAs space cell can be increased by adjusting materials growth parameters, resulting in a demonstration of 16 percent EOL efficiency at one-sun, AMO. Reducing base doping levels to below 3 x 10(exp 17)/cu m and decreasing emitter thickness to 0.3 to 0.5 micron for p-n cells led to significant improvements in radiation hardness as measured by EOL/BOL efficiency ratios for irradiation of 10(exp -15)/sq cm electrons at 1 MeV. BOL efficiency was not affected by changes in emitter thickness but did improve with lower base doping.

  6. Pulse transformer for GaAs laser

    NASA Technical Reports Server (NTRS)

    Rutz, E. M.

    1976-01-01

    High-radiance gallium arsenide (GaAs) laser operating at room temperature is utilized in optical navigation system. For efficient transformer-to-laser impedance match, laser should be connected directly to pulse transformer secondary winding.

  7. GaAs homojunction solar cell development

    NASA Technical Reports Server (NTRS)

    Flood, D. J.; Swartz, C. K.; Hart, R. E., Jr.

    1980-01-01

    The Lincoln Laboratory n(+)/p/p(+) GaAs shallow homojunction cell structure was successfully demonstrated on 2 by 2 cm GaAs substrates. Air mass zero efficiencies of the seven cells produced to date range from 13.6 to 15.6 percent. Current voltage (I-V) characteristics, spectral response, and measurements were made on all seven cells. Preliminary analysis of 1 MeV electron radiation damage data indicate excellent radiation resistance for these cells.

  8. Ohmic contact to GaAs semiconductor

    NASA Technical Reports Server (NTRS)

    Hovel, H. J.; Woodall, J. M.

    1980-01-01

    Multimetallic layers produce stable, low-resistance contacts for p-type GaAs and p-type GaAlAs devices. Contacts present no leakage problems, and their series resistance is too small to measure at 1 Sun intensity. Ohmic contacts are stable and should meet 20-year-life requirement at 150 C for GaAs combined photothermal/photovoltaic concentrators.

  9. Direct-bonded four-junction GaAs solar cells

    NASA Astrophysics Data System (ADS)

    Jingman, Shen; Lijie, Sun; Kaijian, Chen; Wei, Zhang; Xunchun, Wang

    2015-06-01

    Direct wafer bonding technology is able to integrate two smooth wafers and thus can be used in fabricating III-V multijunction solar cells with lattice mismatch. In order to monolithically interconnect between the GaInP/GaAs and InGaAsP/InGaAs subcells, the bonded GaAs/InP heterojunction must be a highly conductive ohmic junction or a tunnel junction. Three types of bonding interfaces were designed by tuning the conduction type and doping elements of GaAs and InP. The electrical properties of p-GaAs (Zn doped)/n-InP (Si doped), p-GaAs (C doped)/n-InP (Si doped) and n-GaAs (Si doped)/n-InP (Si doped) bonded heterojunctions were analyzed from the I-V characteristics. The wafer bonding process was investigated by improving the quality of the sample surface and optimizing the bonding parameters such as bonding temperature, bonding pressure, bonding time and so on. Finally, GaInP/GaAs/InGaAsP/InGaAs 4-junction solar cells have been prepared by a direct wafer bonding technique with the high efficiency of 34.14% at the AM0 condition (1 Sun). Project supported by the Shanghai Rising-Star Program (No. 14QB1402800).

  10. Investigation of the origin of deep levels in CdTe doped with Bi

    SciTech Connect

    Saucedo, E.; Franc, J.; Elhadidy, H.; Horodysky, P.; Ruiz, C. M.; Bermudez, V.; Sochinskii, N. V.

    2008-05-01

    Combining optical (low temperature photoluminescence), electrical (thermoelectric effect spectroscopy), and structural (synchrotron X-ray powder diffraction) methods, the defect structure of CdTe doped with Bi was studied in crystals with dopant concentration in the range of 10{sup 17}-10{sup 19} at./cm{sup 3}. The semi-insulating state observed in crystals with low Bi concentration is assigned to the formation of a shallow donor level and a deep donor recombination center. Studying the evolution of lattice parameter with temperature, we postulate that the deep center is formed by a Te-Te dimer and their formation is explained by a tetrahedral to octahedral distortion, due to the introduction of Bi in the CdTe lattice. We also shows that this model agrees with the electrical, optical, and transport charge properties of the samples.

  11. Sulfur passivation and contact methods for GaAs nanowire solar cells.

    PubMed

    Tajik, N; Peng, Z; Kuyanov, P; LaPierre, R R

    2011-06-03

    The effect of sulfur passivation on core-shell p-n junction GaAs nanowire (NW) solar cells has been investigated. Devices of two types were investigated, consisting of indium tin oxide contact dots or opaque Au finger electrodes. Lateral carrier transport from the NWs to the contact fingers was achieved via a p-doped GaAs surface conduction layer. NWs between the opaque contact fingers had sidewall surfaces exposed for passivation by sulfur. The relative cell efficiency increased by 19% upon passivation. The contribution of the thin film grown between the NWs to the total cell efficiency was estimated by removing the NWs using a sonication procedure. Mechanisms of carrier transport and photovoltaic effects are discussed on the basis of spatially resolved laser scanning measurements.

  12. High-efficiency thin-film GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Stirn, R. J.

    1979-01-01

    GaAs chemical vapor deposition (CVD) growth on single-crystal GaAs substrates was investigated over a temperature range of 600 to 750 C, As/GA mole-ratio range of 3 to 11, and gas molefraction range 5 x 10 to the minus 9th power to 7x 10 to the minus 7th power for H2S doping. GasAs CVD growth on recrystallized Ge films was investigated for a temperature range of 550 to 700 C, an As/GA mole ratio of 5, and for various H2S mole fraction. The highest efficiency cell observed on these films with 2 mm dots was 4.8% (8% when AR-coated). Improvements in fill factor and opencircuit voltage by about 40% each are required in order to obtain efficiencies of 15% or greater.

  13. Spatial distribution of carbon and native defects in large-diameter bulk grown GaAs

    SciTech Connect

    Walukiewicz, W.; Bourret, E.; Yau, W.F.; Mc Murray, R.E. Jr.; Haller, E.E.; Bliss, D.

    1987-04-01

    Different spectroscopic techniques have been combined to measure concentrations of carbon on arsenic sites and of neutral EL2. Utilizing the recently found dependence of the high resolution local vibrational mode spectrum on the charge state of the carbon acceptors we have been able to separately determine concentrations of neutral and ionized carbon after EL2 has been optically quenched. The concentration of ionized carbon shows a very distinct W-shaped variation across the wafer whereas the total carbon concentration is close to constant. The variations are caused by the nonuniform distribution of donors which are shallower than EL2. The account for the commonly observed variations of the near infrared absorption. Radiotracer experiments with GaAs crystals intentionally doped with /sup 14/C showed that carbon is very homogeneously distributed in GaAs grown by horizontal Bridgman method. No correlation between the distribution of carbon and dislocations has been found. 17 refs., 5 figs.

  14. GALLIUM ARSENIDE (GaAs)

    NASA Astrophysics Data System (ADS)

    Levinshtein, M. E.; Rumyantsev, S. L.

    The following sections are included: * Basic Parameters at 300 K * Band Structure and Carrier Concentration * Temperature Dependences * Dependences on Hydrostatic Pressure * Energy Gap Narrowing at High Doping Levels * Effective Masses * Donors and Acceptors * Electrical Properties * Mobility and Hall Effect * Transport Properties in High Electric Field * Impact Ionization * Recombination Parameters * Optical Properties * Thermal Properties * Mechanical Properties, Elastic Constants, Lattice Vibrations, Other Properties * References

  15. Analysis of Hyperabrupt and Uniform Junctions in GaAs for the Application of Varactor Diode.

    PubMed

    Heo, Jun-Woo; Hong, Sejun; Choi, Seok-Gyu; Kim, Hyun-Seok

    2015-10-01

    In this study, we present a GaAs varactor diode with a hyperabrupt junction for the enhancement of breakdown voltage and capacitance variation in a reverse bias state. The hyperabrupt doping profile in the n-type active layer is prepared in a controlled nonlinear manner, with the density of the dopants increasing towards the Schottky junction. The hyperabrupt GaAs varactor diode is fabricated and characterized for breakdown voltage and capacitance over the electric field, induced by an applied reverse bias voltage. A reduced value of the electric field is observed owing to the nonlinear behavior of the electric field at the hyperabrupt junction, although the device has a larger doping density at the Schottky junction. Furthermore, the capacitance ratio of the hyperabrupt junction diode is also improved. Variation in the device capacitance is affected by variation in the depletion region across the junction. Technology CAD is used to understand the experimental phenomena by considering the magnitude of charge density as a function of the doping profile. A higher breakdown voltage and greater capacitance modulation are shown in the hyperabrupt junction diode compared to the uniform junction diode.

  16. Crystal growth of device quality GaAs in space

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.; Lagowski, J.

    1979-01-01

    The optimization of space processing of GaAs is described. The detailed compositional, structural, and electronic characterization of GaAs on a macro- and microscale and the relationships between growth parameters and the properties of GaAs are among the factors discussed. The key parameters limiting device performance are assessed.

  17. Ultrafast properties of femtosecond-laser-ablated GaAs and its application to terahertz optoelectronics.

    PubMed

    Madéo, Julien; Margiolakis, Athanasios; Zhao, Zhen-Yu; Hale, Peter J; Man, Michael K L; Zhao, Quan-Zhong; Peng, Wei; Shi, Wang-Zhou; Dani, Keshav M

    2015-07-15

    We report on the first terahertz (THz) emitter based on femtosecond-laser-ablated gallium arsenide (GaAs), demonstrating a 65% enhancement in THz emission at high optical power compared to the nonablated device. Counter-intuitively, the ablated device shows significantly lower photocurrent and carrier mobility. We understand this behavior in terms of n-doping, shorter carrier lifetime, and enhanced photoabsorption arising from the ablation process. Our results show that laser ablation allows for efficient and cost-effective optoelectronic THz devices via the manipulation of fundamental properties of materials.

  18. Above bandgap luminescence of p-type GaAs epitaxial layers

    NASA Astrophysics Data System (ADS)

    Sapriel, J.; Chavignon, J.; Alexandre, F.; Azoulay, R.; Sermage, B.; Rao, K.; Voos, M.

    1991-08-01

    New photoluminescence bands are observed in p-type GaAs epitaxial layers at 300 and 80 K, above the bandgap. These bands are independent of the nature of the dopant (Zn, Be, C) and of the growth technique (MBE or MOCVD). Their intensities increase as a function of the p doping (1 × 10 17 < p < 2 × 10 20cm-3) and peak at energies which correspond to transitions between the Γ 6, L 6 and X 6 minima of the conduction band and the Γ 8 and Γ 7 maxima of the valence band.

  19. GaAs Solar Cell Radiation Handbook

    NASA Technical Reports Server (NTRS)

    Anspaugh, B. E.

    1996-01-01

    The handbook discusses the history of GaAs solar cell development, presents equations useful for working with GaAs solar cells, describes commonly used instrumentation techniques for assessing radiation effects in solar cells and fundamental processes occurring in solar cells exposed to ionizing radiation, and explains why radiation decreases the electrical performance of solar cells. Three basic elements required to perform solar array degradation calculations: degradation data for GaAs solar cells after irradiation with 1 MeV electrons at normal incidence; relative damage coefficients for omnidirectional electron and proton exposure; and the definition of the space radiation environment for the orbit of interest, are developed and used to perform a solar array degradation calculation.

  20. GaAs solar cell test facility

    NASA Astrophysics Data System (ADS)

    Kawashima, M.; Hosoda, Y.; Suzawa, C.; Shimada, T.; Motoyoshi, K.; Sasatani, Y.

    1982-01-01

    A hybrid type (electricity and heat) GaAs solar cell test facility has been made to evaluate total characteristics of GaAs cell and to study the energy conversion system. The size of a solar collector is 3.4 m x 2.1 m and 60 GaAs cells with Fresnel lenses are attached on it. The solar collector is controlled by a microcomputer to track the sun. Electric energy produced by the cells is stored in a lead-acid battery and then supplied to the load through a DC-AC inverter. The microcomputer also controls the data acquisition in parallel with tracking. This paper presents an overview of the facility and the experimental results of power generation obtained to date.

  1. GaAs photoconductive semiconductor switch

    DOEpatents

    Loubriel, G.M.; Baca, A.G.; Zutavern, F.J.

    1998-09-08

    A high gain, optically triggered, photoconductive semiconductor switch (PCSS) implemented in GaAs as a reverse-biased pin structure with a passivation layer above the intrinsic GaAs substrate in the gap between the two electrodes of the device is disclosed. The reverse-biased configuration in combination with the addition of the passivation layer greatly reduces surface current leakage that has been a problem for prior PCSS devices and enables employment of the much less expensive and more reliable DC charging systems instead of the pulsed charging systems that needed to be used with prior PCSS devices. 5 figs.

  2. GaAs photoconductive semiconductor switch

    DOEpatents

    Loubriel, Guillermo M.; Baca, Albert G.; Zutavern, Fred J.

    1998-01-01

    A high gain, optically triggered, photoconductive semiconductor switch (PCSS) implemented in GaAs as a reverse-biased pin structure with a passivation layer above the intrinsic GaAs substrate in the gap between the two electrodes of the device. The reverse-biased configuration in combination with the addition of the passivation layer greatly reduces surface current leakage that has been a problem for prior PCSS devices and enables employment of the much less expensive and more reliable DC charging systems instead of the pulsed charging systems that needed to be used with prior PCSS devices.

  3. Electron channel mobility in silicon-doped Ga2O3 MOSFETs with a resistive buffer layer

    NASA Astrophysics Data System (ADS)

    Wong, Man Hoi; Sasaki, Kohei; Kuramata, Akito; Yamakoshi, Shigenobu; Higashiwaki, Masataka

    2016-12-01

    The electron mobility in depletion-mode lateral β-Ga2O3(010) metal-oxide-semiconductor field-effect transistors (MOSFETs) with an n-channel formed by Si-ion (Si+) implantation doping was extracted using low-field electrical measurements on FET structures. An undoped Ga2O3 buffer layer protected the channel against charge compensation by suppressing outdiffusion of deep Fe acceptors from the semi-insulating substrate. The molecular beam epitaxy growth temperature was identified as a key process parameter for eliminating parasitic conduction at the buffer/substrate growth interface. Devices with a resistive buffer showed room temperature channel mobilities of 90-100 cm2 V-1 s-1 at carrier concentrations of low- to mid-1017 cm-3, with small in-plane mobility anisotropy of 10-15% ascribable to anisotropic carrier scattering.

  4. Ion Implanted GaAs I.C. Process Technology

    DTIC Science & Technology

    1981-07-01

    in ion implantation in GaAs, coupled with better control of the substrate material. 1 Once ion implantation became a reliable processing technology it... Processing Technology for Planar GaAs Integrated Circuits," GaAs IC Symposium, Lake Tahoe, CA., Sept. 1979. 20. R.C. Eden, "GaAs Integrated Circuit Device...1980. 25. B.M. Welch, "Advances in GaAs LSI!VLSI Processing Technology ," Sol. St. Tech., Feb. 1980, pp. 95-101. 27. R. Zucca, B.M. Welch, P.M

  5. GaAs nanowire array solar cells with axial p-i-n junctions.

    PubMed

    Yao, Maoqing; Huang, Ningfeng; Cong, Sen; Chi, Chun-Yung; Seyedi, M Ashkan; Lin, Yen-Ting; Cao, Yu; Povinelli, Michelle L; Dapkus, P Daniel; Zhou, Chongwu

    2014-06-11

    Because of unique structural, optical, and electrical properties, solar cells based on semiconductor nanowires are a rapidly evolving scientific enterprise. Various approaches employing III-V nanowires have emerged, among which GaAs, especially, is under intense research and development. Most reported GaAs nanowire solar cells form p-n junctions in the radial direction; however, nanowires using axial junction may enable the attainment of high open circuit voltage (Voc) and integration into multijunction solar cells. Here, we report GaAs nanowire solar cells with axial p-i-n junctions that achieve 7.58% efficiency. Simulations show that axial junctions are more tolerant to doping variation than radial junctions and lead to higher Voc under certain conditions. We further study the effect of wire diameter and junction depth using electrical characterization and cathodoluminescence. The results show that large diameter and shallow junctions are essential for a high extraction efficiency. Our approach opens up great opportunity for future low-cost, high-efficiency photovoltaics.

  6. Defect studies in low-temperature-grown GaAs

    SciTech Connect

    Bliss, D.E.

    1992-11-01

    High content of excess As is incorporated in GaAs grown by low-temperature molecular-beam-epitaxy (LTMBE). The excess As exists primarily as As antisite defects AsGa and a lesser extent of gallium vacancies V{sub Ga}. The neutral AsGa-related defects were measured by infrared absorption at 1{mu}m. Gallium vacancies, V{sub Ga}, was investigated by slow positron annihilation. Dependence of defect contents on doping was studied by Si and Be dopants. No free carriers are generated by n-type or p-type doping up to 10{sup 19} cm{sup {minus}3} Si or Be. Raman data indicate Be occupies Ga substitutional sites but Si atom is not substitutional. Si induces more As{sub Ga} in the layer. As As{sub Ga} increases, photoquenchable As{sub Ga} decreases. Fraction of photoquenchable defects correlates to defects within 3 nearest neighbor separations disrupting the metastability. Annealing reduces neutral As{sub Ga} content around 500C, similar to irradiation damaged and plastically deformed Ga{sub As}, as opposed to bulk grown GaAs in which As{sub Ga}-related defects are stable up to 1100C. The lower temperature defect removal is due to V{sub Ga} enhanced diffusion of As{sub Ga} to As precipitates. The supersaturated V{sub GA} and also decreases during annealing. Annealing kinetics for As{sub Ga}-related defects gives 2.0 {plus_minus} 0.3 eV and 1.5 {plus_minus} 0.3 eV migration enthalpies for the As{sub Ga} and V{sub Ga}. This represents the difference between Ga and As atoms hopping into the vacancy. The non-photoquenchable As{sub Ga}-related defects anneal with an activation energy of 1.1 {plus_minus} 0.3eV. Be acceptors can be activated by 800C annealing. Temperature difference between defect annealing and Be activation formation of As{sub Ga}-Be{sub Ga} pairs. Si donors can only be partially activated.

  7. Defect studies in low-temperature-grown GaAs

    SciTech Connect

    Bliss, D.E.

    1992-11-01

    High content of excess As is incorporated in GaAs grown by low-temperature molecular-beam-epitaxy (LTMBE). The excess As exists primarily as As antisite defects AsGa and a lesser extent of gallium vacancies V[sub Ga]. The neutral AsGa-related defects were measured by infrared absorption at 1[mu]m. Gallium vacancies, V[sub Ga], was investigated by slow positron annihilation. Dependence of defect contents on doping was studied by Si and Be dopants. No free carriers are generated by n-type or p-type doping up to 10[sup 19] cm[sup [minus]3] Si or Be. Raman data indicate Be occupies Ga substitutional sites but Si atom is not substitutional. Si induces more As[sub Ga] in the layer. As As[sub Ga] increases, photoquenchable As[sub Ga] decreases. Fraction of photoquenchable defects correlates to defects within 3 nearest neighbor separations disrupting the metastability. Annealing reduces neutral As[sub Ga] content around 500C, similar to irradiation damaged and plastically deformed Ga[sub As], as opposed to bulk grown GaAs in which As[sub Ga]-related defects are stable up to 1100C. The lower temperature defect removal is due to V[sub Ga] enhanced diffusion of As[sub Ga] to As precipitates. The supersaturated V[sub GA] and also decreases during annealing. Annealing kinetics for As[sub Ga]-related defects gives 2.0 [plus minus] 0.3 eV and 1.5 [plus minus] 0.3 eV migration enthalpies for the As[sub Ga] and V[sub Ga]. This represents the difference between Ga and As atoms hopping into the vacancy. The non-photoquenchable As[sub Ga]-related defects anneal with an activation energy of 1.1 [plus minus] 0.3eV. Be acceptors can be activated by 800C annealing. Temperature difference between defect annealing and Be activation formation of As[sub Ga]-Be[sub Ga] pairs. Si donors can only be partially activated.

  8. GaAs Substrates for High-Power Diode Lasers

    NASA Astrophysics Data System (ADS)

    Mueller, Georg; Berwian, Patrick; Buhrig, Eberhard; Weinert, Berndt

    GaAs substrate crystals with low dislocation density (Etch-Pit Density (EPD) < 500,^-2) and Si-doping ( ~10^18,^-3) are required for the epitaxial production of high-power diode-lasers. Large-size wafers (= 3 mathrm{in} -> >=3,) are needed for reducing the manufacturing costs. These requirements can be fulfilled by the Vertical Bridgman (VB) and Vertical Gradient Freeze (VGF) techniques. For that purpose we have developed proper VB/VGF furnaces and optimized the thermal as well as the physico-chemical process conditions. This was strongly supported by extensive numerical process simulation. The modeling of the VGF furnaces and processes was made by using a new computer code called CrysVUN++, which was recently developed in the Crystal Growth Laboratory in Erlangen.GaAs crystals with diameters of 2 and 3in were grown in pyrolytic Boron Nitride (pBN) crucibles having a small-diameter seed section and a conical part. Boric oxide was used to fully encapsulate the crystal and the melt. An initial silicon content in the GaAs melt of c (melt) = 3 x10^19,^-3 has to be used in order to achieve a carrier concentration of n = (0.8- 2) x10^18,^-3, which is the substrate specification of the device manufacturer of the diode-laser. The EPD could be reduced to values between 500,^-2 and 50,^-2 with a Si-doping level of 8 x10^17 to 1 x10^18,^-3. Even the 3in wafers have rather large dislocation-free areas. The lowest EPDs ( <100,^-2) are achieved for long seed wells of the crucible.

  9. Au impact on GaAs epitaxial growth on GaAs (111)B substrates in molecular beam epitaxy

    NASA Astrophysics Data System (ADS)

    Liao, Zhi-Ming; Chen, Zhi-Gang; Lu, Zhen-Yu; Xu, Hong-Yi; Guo, Ya-Nan; Sun, Wen; Zhang, Zhi; Yang, Lei; Chen, Ping-Ping; Lu, Wei; Zou, Jin

    2013-02-01

    GaAs growth behaviour under the presence of Au nanoparticles on GaAs {111}B substrate is investigated using electron microscopy. It has been found that, during annealing, enhanced Ga surface diffusion towards Au nanoparticles leads to the GaAs epitaxial growth into {113}B faceted triangular pyramids under Au nanoparticles, governed by the thermodynamic growth, while during conventional GaAs growth, growth kinetics dominates, resulting in the flatted triangular pyramids at high temperature and the epitaxial nanowires growth at relatively low temperature. This study provides an insight of Au nanoparticle impact on GaAs growth, which is critical for understanding the formation mechanisms of semiconductor nanowires.

  10. P-doping mechanisms in catalyst-free gallium arsenide nanowires.

    PubMed

    Dufouleur, Joseph; Colombo, Carlo; Garma, Tonko; Ketterer, Bernt; Uccelli, Emanuele; Nicotra, Marco; Fontcuberta i Morral, Anna

    2010-05-12

    Doped catalyst-free GaAs nanowires have been grown by molecular beam epitaxy with the gallium-assisted method. The spatial dependence of the dopant concentration and resistivity have been measured by Raman spectroscopy and four point electrical measurements. Along with theoretical considerations, the doping mechanisms have been revealed. Two competing mechanisms have been revealed: dopant incorporation from the side facets and from the gallium droplet. In the latter incorporation path, doping compensation seems to play an important role in the effective dopant concentration. Hole concentrations of at least 2.4 x 10(18) cm(-3) have been achieved, which to our knowledge is the largest p doping range obtained up to date. This work opens the avenue for the use of doped GaAs nanowires in advanced applications and in mesoscopic physics experiments.

  11. GaAs Solar Cell Radiation Handbook

    NASA Technical Reports Server (NTRS)

    Anspaugh, B. E.

    1996-01-01

    History of GaAs solar cell development is provided. Photovoltaic equations are described along with instrumentation techniques for measuring solar cells. Radiation effects in solar cells, electrical performance, and spacecraft flight data for solar cells are discussed. The space radiation environment and solar array degradation calculations are addressed.

  12. GaAs optoelectronic neuron arrays

    NASA Technical Reports Server (NTRS)

    Lin, Steven; Grot, Annette; Luo, Jiafu; Psaltis, Demetri

    1993-01-01

    A simple optoelectronic circuit integrated monolithically in GaAs to implement sigmoidal neuron responses is presented. The circuit integrates a light-emitting diode with one or two transistors and one or two photodetectors. The design considerations for building arrays with densities of up to 10,000/sq cm are discussed.

  13. Image transfer in photorefractive GaAs

    NASA Technical Reports Server (NTRS)

    Cheng, Li-Jen; Gheen, Gregory; Rau, Mann-Fu; Wang, Faa-Ching

    1987-01-01

    Image transfer from one beam to the other using counterpropagation beam coupling in GaAs was demonstrated. Good image quality was achieved. The results also reveal that local birefringence due to the residual stress/strain field in the crystal can degrade the image quality.

  14. Homojunction GaAs solar cells grown by close space vapor transport

    SciTech Connect

    Boucher, Jason W.; Ritenour, Andrew J.; Greenaway, Ann L.; Aloni, Shaul; Boettcher, Shannon W.

    2014-06-08

    We report on the first pn junction solar cells grown by homoepitaxy of GaAs using close space vapor transport (CSVT). Cells were grown both on commercial wafer substrates and on a CSVT absorber film, and had efficiencies reaching 8.1%, open circuit voltages reaching 909 mV, and internal quantum efficiency of 90%. The performance of these cells is partly limited by the electron diffusion lengths in the wafer substrates, as evidenced by the improved peak internal quantum efficiency in devices fabricated on a CSVT absorber film. Unoptimized highly-doped n-type emitters also limit the photocurrent, indicating that thinner emitters with reduced doping, and ultimately wider band gap window or surface passivation layers, are required to increase the efficiency.

  15. Dilute nitride and GaAs n-i-p-i solar cells.

    PubMed

    Mazzucato, Simone; Royall, Benjamin; Ketlhwaafetse, Richard; Balkan, Naci; Salmi, Joel; Puustinen, Janne; Guina, Mircea; Smith, Andy; Gwilliam, Russell

    2012-11-20

    We demonstrate for the first time the operation of GaInNAs and GaAs n-i-p-i doping solar cells with ion-implanted selective contacts. Multiple layers of alternate doping are grown by molecular beam epitaxy to form the n-i-p-i structure. After growth, vertical selective contacts are fabricated by Mg and Si ion implantation, followed by rapid thermal annealing treatment and fabrication into circular mesa cells. As means of characterisation, spectral response and illuminated current-voltage (I-V) were measured on the samples. The spectral response suggests that all horizontal layers are able to contribute to the photocurrent. Performance of the devices is discussed with interest in the n-i-p-i structure as a possible design for the GaInP/GaAs/GaInNAs tandem solar cell.

  16. Dilute nitride and GaAs n-i-p-i solar cells

    PubMed Central

    2012-01-01

    We demonstrate for the first time the operation of GaInNAs and GaAs n-i-p-i doping solar cells with ion-implanted selective contacts. Multiple layers of alternate doping are grown by molecular beam epitaxy to form the n-i-p-i structure. After growth, vertical selective contacts are fabricated by Mg and Si ion implantation, followed by rapid thermal annealing treatment and fabrication into circular mesa cells. As means of characterisation, spectral response and illuminated current–voltage (I-V) were measured on the samples. The spectral response suggests that all horizontal layers are able to contribute to the photocurrent. Performance of the devices is discussed with interest in the n-i-p-i structure as a possible design for the GaInP/GaAs/GaInNAs tandem solar cell. PMID:23167964

  17. Ion Implanted Gaas Integrated Optics Fabrication Technology

    NASA Astrophysics Data System (ADS)

    Mentzer, M. A.; Hunsperger, R. G.; Bartko, J.; Zavada, J. M.; Jenkinson, H. A.

    1985-01-01

    Ion implantation of semiconductor materials is a fabrication technique that offers a number of distinct advantages for the formation of guided-wave components and microelectronic devices. Implanted damage and dopants produce optical and electronic changes that can be utilized for sensing and signal processing applications. GaAs is a very attractive material for optical fabrication since it is transparent out to the far infrared. It can be used to fabricate optical waveguides, directional couplers, EO modulators, and detectors, as well as other guided wave structures. The presence of free carriers in GaAs lowers the refractive index from that of the pure semiconductor material. This depression of the refractive index is primarily due to the negative contribution of the free carrier plasma to the dielectric constant of the semiconductor. Bombardment of n-type GaAs by protons creates damage sites near the surface of the crystal structure where free carriers are trapped. This "free carrier compensated" region in the GaAs has a higher refractive index than the bulk region. If the compensated region is sufficiently thick and has a refractive index which is sufficiently larger than that of the bulk n-type region, an optical waveguide is formed. In this paper, a description of ion implantation techniques for the fabrication of both planar and channel integrated optical structures in GaAs is presented, and is related to the selection of ion species, implant energy and fluence, and to the physical processes involved. Lithographic technology and masking techniques are discussed for achieving a particular desired implant profile. Finally, the results of a set of ion implantation experiments are presented.

  18. Contact properties to CVD-graphene on GaAs substrates for optoelectronic applications.

    PubMed

    Babichev, A V; Gasumyants, V E; Egorov, A Yu; Vitusevich, S; Tchernycheva, M

    2014-08-22

    The optimization of contacts between graphene and metals is important for many optoelectronic applications. In this work, we evaluate the contact resistance and sheet resistance of monolayer and few-layered graphene with different metallizations using the transfer length method (TLM). Graphene was obtained by the chemical vapor deposition technique (CVD-graphene) and transferred onto GaAs and Si/SiO₂ substrates. To account for the quality of large-area contacts used in a number of practical applications, a millimeter-wide TLM pattern was used for transport measurements. Different metals--namely, Ag, Pt, Cr, Au, Ni, and Ti--have been tested. The minimal contact resistance Rc obtained in this work is 11.3 kΩ μm for monolayer CVD-graphene, and 6.3 kΩ μm for a few-layered graphene. Annealing allows us to decrease the contact resistance Rc and achieve 1.7 kΩm μm for few-layered graphene on GaAs substrate with Au contacts. The minimal sheet resistance Rsh of few-layered graphene transferred to GaAs and Si/SiO₂ substrates are 0.28 kΩ/□ and 0.27 kΩ/□. The Rsh value of monolayer graphene on the GaAs substrate is 8 times higher (2.3 kΩ/□), but it reduces for the monolayer graphene on Si/SiO₂ (1.4 kΩ/□). For distances between the contacts below 5 μm, a considerable reduction in the resistance per unit length was observed, which is explained by the changes in doping level caused by graphene suspension at small distances between contact pads.

  19. Zn diffusion in Al/0.7/Ga/0.3/As compared with that in GaAs. [solar cells

    NASA Technical Reports Server (NTRS)

    Flat, A.; Milnes, A. G.; Feucht, D. L.

    1977-01-01

    Zinc was diffused into 4 times 10 to the 17th per cu cm n-type Al(0.7)Ga(0.3)As grown by liquid-phase epitaxy and also into n-type 2 times 10 to the 17th per cu cm doped GaAs slices at 600, 650, and 750 C. The Zn diffusion coefficient in the Al(0.7)Ga(0.3)As was about one order of magnitude larger than in GaAs. The significance of this fact is that diffusion of Zn through a 0.5 micron Al(0.7)Ga(0.3)As layer appears to be possible with adequate control of the junction depth in the underlying GaAs.

  20. Laser doping and metallization of wide bandgap materials: silicon carbide, gallium nitride, and aluminum nitride

    NASA Astrophysics Data System (ADS)

    Salama, Islam Abdel Haleem

    A laser direct write and doping (LDWD) system is designed and utilized for direct metallization and selective area doping in different SiC polytypes, GaN and in dielectrics including AlN. Laser direct metallization in 4H- and 6H-SiC generates metal-like conductive phases that are produced as both rectifying and ohmic contacts without metal deposition. Nd:YAG (lambda = 532, 1064 nm) nanosecond pulsed laser irradiation in SiC induces carbon-rich conductive phases by thermal decomposition of SiC while UV excimer (lambda = 193 nm) laser irradiation produces a silicon-rich phase due to selective carbon photoablation. Linear transmission line method (TLM) pattern is directly fabricated in single crystals SiC by pulsed laser irradiation allowing characterization of the laser fabricated metal-like contacts. Activation of a self focusing effect at the frequency doubled Nd:YAG laser irradiation (lambda = 532 nm) allows to fabricate buried metal like contacts in SiC wafers while maintaining their device-ready surface condition. Gas immersion laser doping (GILD) and laser doping from a molten precursor are utilized to dope both GaN and SiC. Trimethylaluminum (TMAl) and nitrogen are the precursors used to produce p-type and n-type doped SiC; respectively. Nd:YAG and excimer laser nitrogen doping in SiC epilayer and single crystal substrates increases the dopant concentration by two orders of magnitude and produces both deep (500--600 nm) and shallow (50 nm) junctions, respectively. Laser assisted effusion/diffusion is introduced and utilized to dope Al in SiC wafers. Using this technique, a150 nm p-type doped junction is fabricated in semi-insulating 6H- and n-type doped 4H-SiC wafers. Laser-induced p-type doping of Mg in single crystal GaN is conducted using Bis-magnesium dihydrate [Mg(TMHD)2]. Mg concentration and penetration depth up to 10 20--1021 cm-3 and 5mum, respectively are achieved using various laser doping techniques. Laser direct writing and doping (LDWD) is a

  1. Variation of spectral response curves of GaAs photocathodes in activation chamber

    NASA Astrophysics Data System (ADS)

    Zou, Jijun; Chang, Benkang; Yang, Zhi; Wang, Hui; Gao, Pin

    2006-09-01

    The spectral response curves of reflection-mode GaAs (100) photocathodes are measured in activation chamber by multi-information measurement system at RT, and by applying quantum efficiency formula, the variation of spectral response curves have been studied. Reflection-mode GaAs photocathodes materials are grown over GaAs wafer (100) by MBE with p-type beryllium doping, doping concentration is 1×10 19 cm -3 and the active layer thickness is 1.6μm. During the high-temperature activation process, the spectral response curves varied with activation time are measured. After the low-temperature activation, the photocathode is illuminated by a white light source, and the spectral response curves varied with illumination time are measured every other hour. Experimental results of both high-temperature and low-temperature activations show that the spectral response curve shape of photocathodes is a function of time. We use traditional quantum efficiency formulas of photocathodes, in which only the Γ photoemission is considered, to fit experimental spectral response curves, and find the theoretical curves are not in agreement with the experimental curves, the reason is other valley and hot-electron yields are necessary to be included in yields of reflection-mode photocathodes. Based on the two-minima diffusion model and the fit of escape probability, we modified the quantum efficiency formula of reflection-mode photocathodes, the modified formula can be used to explain the variation of yield curves of reflection-mode photocathodes very well.

  2. Te incorporation in GaAs1-xSbx nanowires and p-i-n axial structure

    NASA Astrophysics Data System (ADS)

    Ahmad, Estiak; Kasanaboina, P. K.; Karim, M. R.; Sharma, M.; Reynolds, C. L.; Liu, Y.; Iyer, S.

    2016-12-01

    We report on in situ Te-doping in GaAs1-xSbx nanowires (NWs) grown via self-assisted molecular beam epitaxy. Enhanced Te incorporation in the NW at higher Te cell temperature was attested by the broadening of the x-ray diffraction peak and the presence of a strong coupled-LO phonon mode in the Raman spectra. Te-doping was estimated from the shift in the coupled-LO phonon mode to be ˜2.0 × 1018/cm3. The surfactant nature of the Te modulated the growth kinetics, which was manifested in an enhanced radial growth rate with improved photoluminescence (PL) characteristics at both room temperature (RT) and 4 K. No noticeable planar defects were observed as ascertained from the high-resolution transmission electron microscopy images and selected-area electron diffraction patterns. Finally, we demonstrate the experimental realization of a GaAs1-xSbx axial p-type/intrinsic/n-type (p-i-n) structure on a Si substrate with Te as the n-type dopant. The GaAs1-xSbx p-i-n NW structures exhibited rectifying current-voltage (I-V) behavior. The dopant concentration and the transport parameters estimated from the PL spectra and I-V curve were found to be in good agreement.

  3. Growth of GaAs in a rotating disk MOCVD reactor

    NASA Astrophysics Data System (ADS)

    Thompson, A. G.; Sundaram, V. S.; Girard, G. R.; Fraas, L. M.

    1989-04-01

    We report the growth of GaAs homoepitaxial films from trimethylgallium and arsine in a multi-wafer rotating disk reactor. In this configuration the substrates are mounted on a disk that is spun at high speed (> 1000 rpm) in a sub-atmospheric (<100 Torr) environment. The spinning disk pumps the reactant and carrier gases radially outwards; under optimum conditions, convective recirculating cells are avoided, thus facilitating rapid transitions in doping and composition in the grown layers. In this paper we look at the morphology, growth rate and electrical properties of the GaAs epitaxial layers as a function of substrate temperature, V/III ratio, dopant type, spin speed and hydrogen carrier flow conditions. These results are compared with those obtained in conventional MOCVD reactors. Silicon and tellurium doping over a wide range of carrier concentrations has been achieved with excellent mobilities and uniformity across the wafers. Preliminary results on MESFET's fabricated from n +/n/buffer structures show good device characteristics.

  4. An Electron-Beam Controlled Semiconductor Switch

    DTIC Science & Technology

    1989-11-01

    Lakdawala, Old Dominion University. The behavior of semi- insulating GaAs is investigated in the Pulsed mode under strong electric fields. In particular...published yet. 3 I (8)I I 6. Measurements of the current-voltage characteristics of semi- insulating GaAs were per- formed with the purpose of...MD, May 1989 [9] David C. Stoudt, K.H. Schoenbach and V.K. Lakdawala, "THE ELECTRICAL CHARACTERISTICS OF SEMI- INSULATING Gais FOR HIGH POWER

  5. High mobility single-crystalline-like GaAs thin films on inexpensive flexible metal substrates by metal-organic chemical vapor deposition

    SciTech Connect

    Dutta, P. Rathi, M.; Gao, Y.; Yao, Y.; Selvamanickam, V.; Zheng, N.; Ahrenkiel, P.; Martinez, J.

    2014-09-01

    We demonstrate heteroepitaxial growth of single-crystalline-like n and p-type doped GaAs thin films on inexpensive, flexible, and light-weight metal foils by metal-organic chemical vapor deposition. Single-crystalline-like Ge thin film on biaxially textured templates made by ion beam assisted deposition on metal foil served as the epitaxy enabling substrate for GaAs growth. The GaAs films exhibited strong (004) preferred orientation, sharp in-plane texture, low grain misorientation, strong photoluminescence, and a defect density of ∼10{sup 7 }cm{sup −2}. Furthermore, the GaAs films exhibited hole and electron mobilities as high as 66 and 300 cm{sup 2}/V-s, respectively. High mobility single-crystalline-like GaAs thin films on inexpensive metal substrates can pave the path for roll-to-roll manufacturing of flexible III-V solar cells for the mainstream photovoltaics market.

  6. Experimental and theoretical study of passively Q-switched Yb:YAG laser with GaAs saturable absorber near 1050 nm

    NASA Astrophysics Data System (ADS)

    Chu, Hongwei; Zhao, Shengzhi; Yang, Kejian; Li, Yuefei; Li, Dechun; Li, Guiqiu; Zhao, Jia; Qiao, Wenchao; Xu, Xiaodong; Di, Juqing; Zheng, Lihe; Xu, Jun

    2014-03-01

    A diode-end-pumped passively Q-switched ytterbium-doped yttrium aluminum garnet (Yb:YAG) laser with gallium arsenide (GaAs) wafer as saturable absorber has been realized. In the experiment, two pieces of GaAs wafers with respective thicknesses of 400 and 700 μm were used respectively. The output laser characteristics such as the pulse duration, single pulse energy and peak power, have been measured. By using thicker GaAs wafer as saturable absorber, a minimum pulse duration of 3.5 ns was obtained with an average output power of 361 mW and a pulse repetition rate (PRR) of 25 kHz, corresponding to a single pulse energy of 19.6 μJ and a peak power of 5.7 kW. With a 400 μm-thick GaAs wafer as saturable absorber, a maximum output power of 469 mW was achieved. The central wavelength of the laser was measured to be 1050.4 nm at pump power of 7.8 W and dual wavelength operation peaked at 1049.3 nm and 1051.6 nm was observed at a high pump power of 10 W. By considering Gaussian spatial distribution and the thermal effects in the gain medium, the coupled rate equations for passively Q-switched Yb:YAG laser with GaAs saturable absorber were given.

  7. Characteristics of cylindrical surrounding-gate GaAs x Sb1-x /In y Ga1-y As heterojunction tunneling field-effect transistors

    NASA Astrophysics Data System (ADS)

    Guan, Yun-He; Li, Zun-Chao; Luo, Dong-Xu; Meng, Qing-Zhi; Zhang, Ye-Fei

    2016-10-01

    A III-V heterojunction tunneling field-effect transistor (TFET) can enhance the on-state current effectively, and GaAs x Sb1-x /In y Ga1-y As heterojunction exhibits better performance with the adjustable band alignment by modulating the alloy composition. In this paper, the performance of the cylindrical surrounding-gate GaAs x Sb1-x /In y Ga1-y As heterojunction TFET with gate-drain underlap is investigated by numerical simulation. We validate that reducing drain doping concentration and increasing gate-drain underlap could be effective ways to reduce the off-state current and subthreshold swing (SS), while increasing source doping concentration and adjusting the composition of GaAs x Sb1-x /In y Ga1-y As can improve the on-state current. In addition, the resonant TFET based on GaAs x Sb1-x /In y Ga1-y As is also studied, and the result shows that the minimum and average of SS reach 11 mV/decade and 20 mV/decade for five decades of drain current, respectively, and is much superior to the conventional TFET. Project supported by the National Natural Science Foundation of China (Grant Nos. 61176038 and 61474093), the Science and Technology Planning Project of Guangdong Province, China (Grant No. 2015A010103002), and the Technology Development Program of Shaanxi Province, China (Grant No. 2016GY-075).

  8. GaAs shallow-homojunction solar cells

    NASA Technical Reports Server (NTRS)

    Fan, J. C. C.

    1981-01-01

    The feasibility of fabricating space resistant, high efficiency, light weight, low cost GaAs shallow homojunction solar cells for space application is investigated. The material preparation of ultrathin GaAs single crystal layers, and the fabrication of efficient GaAs solar cells on bulk GaAs substrates are discussed. Considerable progress was made in both areas, and conversion efficiency about 16% AMO was obtained using anodic oxide as a single layer antireflection coating. A computer design shows that even better cells can be obtained with double layer antireflection coating. Ultrathin, high efficiency solar cells were obtained from GaAs films prepared by the CLEFT process, with conversion efficiency as high as 17% at AMI from a 10 micrometers thick GaAs film. A organometallic CVD was designed and constructed.

  9. High Growth Rate Metal-Organic Molecular Beam Epitaxy for the Fabrication of GaAs Space Solar Cells

    NASA Technical Reports Server (NTRS)

    Freundlich, A.; Newman, F.; Monier, C.; Street, S.; Dargan, P.; Levy, M.

    2005-01-01

    In this work it is shown that high quality GaAs photovoltaic devices can be produced by Molecular Beam Epitaxy (MBE) with growth rates comparable to metal-organic chemical vapor deposition (MOCVD) through the subsitution of group III solid sources by metal-organic compounds. The influence the III/V flux-ratio and growth temperatures in maintaining a two dimensional layer by layer growth mode and achieving high growth rates with low residual background impurities is investigated. Finally subsequent to the study of the optimization of n- and p doping of such high growth rate epilayers, results from a preliminary attempt in the fabrication of GaAs photovoltaic devices such as tunnel diodes and solar cells using the proposed high growth rate approach are reported.

  10. Excitons Bound to Nitrogen Pairs in GaAs as Seen by Photoluminescence of High Spectral and Spatial Resolution

    SciTech Connect

    Karaiskaj, D.; Mascarenhas, A.; Klem, J. F.; Volz, K.; Stolz, W.; Adamcyk, M.; Tiedje, T.

    2007-01-01

    High resolution photoluminescence (PL) spectroscopy was performed on high quality bulk GaAs, lightly doped with the nitrogen isoelectronic impurity. The shallowest nitrogen pair bound exciton center labeled as X{sub 1} revealed a total of six transitions. The photoluminescence lines from a small ensemble of nitrogen centers showed polarization dependent intensity. High spectral resolution PL spectroscopy was combined with confocal spectroscopy experiments performed on a GaAs:N/AlGaAs heterostructure. The high spatial resolution achieved by this technique enables us to localize and examine individual nitrogen bound excitons. Similar spectral structure and polarization dependence was observed for individual N-pair centers in GaAs. Both techniques support the C{sub 2v} symmetry of such isoelectronic impurity centers. The comparison between the PL spectra from an ensemble of nitrogen pairs and individual centers demonstrate the ability of the single impurity technique to lift the orientational degeneracy.

  11. High-Temperature In situ Deformation of GaAs Micro-pillars: Lithography Versus FIB Machining

    NASA Astrophysics Data System (ADS)

    Chen, M.; Wehrs, J.; Michler, J.; Wheeler, J. M.

    2016-11-01

    The plasticity of silicon-doped GaAs was investigated between 25°C and 400°C using microcompression to prevent premature failure by cracking. Micropillars with diameters of 2.5 μm were fabricated on a < 100rangle -oriented GaAs single crystal by means of both conventional lithographic etching techniques and focused ion beam machining and then compressed in situ in the scanning electron microscope (SEM). A transition in deformation mechanisms from partial dislocations to perfect dislocations was found at around 100°C. At lower temperatures, the residual surface layer from lithographic processing was found to provide sufficient constraint to prevent crack opening, which resulted in a significant increase in ductility over FIB-machined pillars. Measured apparent activation energies were found to be significantly lower than previous bulk measurements, which is mostly attributed to the silicon dopant and to a lesser extent to the size effect.

  12. Rapid thermal annealing of Be, Si, and Zn implanted GaAs using an ultrahigh power argon arc lamp

    NASA Astrophysics Data System (ADS)

    Tabatabaie-Alavi, K.; Masum Choudhury, A. N. M.; Fonstad, C. G.; Gelpey, J. C.

    1983-09-01

    The use of a 100-kW water-walled dc argon lamp to anneal ion-implanted GaAs is reported. Annealing cycles of 3 and 10 s and peak temperatures from 950 to 1200 C have been used to anneal Be, Si, and Zn implanted following representative implant schedules of technological importance. It is demonstrated that this technique is superior to conventional furnace anneal techniques in terms of the doping profiles, peak carrier concentrations, activation efficiencies (particularly at high doses), and mobilities achieved. The annealing technique should be applicable to large volume GaAs integrated circuit production and 100-mm-diam wafers can be annealed in a single exposure with better than 2 percent temperature uniformity (Si data).

  13. Carbon Doping of Compound Semiconductor Epitaxial Layers Grown by Metalorganic Chemical Vapor Deposition Using Carbon Tetrachloride.

    NASA Astrophysics Data System (ADS)

    Cunningham, Brian Thomas

    1990-01-01

    A dilute mixture of CCl_4 in high purity H_2 has been used as a carbon dopant source for rm Al_ {x}Ga_{1-x}As grown by low pressure metalorganic chemical vapor deposition (MOCVD). To understand the mechanism for carbon incorporation from CCl_4 doping and to provide experimental parameters for the growth of carbon doped device structures, the effects of various crystal growth parameters on CCl _4 doping have been studied, including growth temperature, growth rate, V/III ratio, Al composition, and CCl_4 flow rate. Although CCl _4 is an effective p-type dopant for MOCVD rm Al_{x}Ga_ {1-x}As, injection of CCl_4 into the reactor during growth of InP resulted in no change in the carrier concentration or carbon concentration. Abrupt, heavy carbon doping spikes in GaAs have been obtained using CCl_4 without a dopant memory effect. By annealing samples with carbon doping spikes grown within undoped, n-type, and p-type GaAs, the carbon diffusion coefficient in GaAs at 825 ^circC has been estimated and has been found to depend strongly on the GaAs background doping. Heavily carbon doped rm Al_{x}Ga _{1-x}As/GaAs superlattices have been found to be more stable against impurity induced layer disordering (IILD) than Mg or Zn doped superlattices, indicating that the low carbon diffusion coefficient limits the IILD process. Carbon doping has been used in the base region on an Npn AlGaAs/GaAs heterojunction bipolar transistor (HBT). Transistors with 3 x 10 μm self-aligned emitter fingers have been fabricated which exhibit a current gain cutoff frequency of f_ {rm t} = 26 GHz.

  14. Eight-Bit-Slice GaAs General Processor Circuit

    NASA Technical Reports Server (NTRS)

    Weissman, John; Gauthier, Robert V.

    1989-01-01

    Novel GaAs 8-bit slice enables quick and efficient implementation of variety of fast GaAs digital systems ranging from central processing units of computers to special-purpose processors for communications and signal-processing applications. With GaAs 8-bit slice, designers quickly configure and test hearts of many digital systems that demand fast complex arithmetic, fast and sufficient register storage, efficient multiplexing and routing of data words, and ease of control.

  15. LSI/VLSI Ion Implanted GaAs IC Processing

    DTIC Science & Technology

    1982-02-10

    insulating High Speed Logic Ion Implantation GaAs IC FET Integrated Circuits MESFET 20. ABSTRACT (Coalki. on.. roersie if oookay and IdoeI by WOOe tw**, This...The goal of this program is to realize the full potential of GaAs digital integrated circuits employing depletion mode MESFETs by developing the...Processing. The main objective of this program is to realize the full potential of GaAs digital integrated circuits by expanding and improving

  16. Passivation of GaAs Surfaces.

    DTIC Science & Technology

    1980-08-15

    hour at indicated temperatures. Each symbol indicates one of four pieces of the same starting crystal . Three of the pieces were treated four times. The...Each symbol indicates one of four pieces of the same starting crystal . Three of the pieces were treated three times ................................ 9... crystal 11 11. Luminescence intensity of GaAs treated in ammonia plasma at 575*C as a function of treatment time. Each symbol represents one of five

  17. High efficiency, low cost thin GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Fan, J. C. C.

    1982-01-01

    The feasibility of fabricating space-resistant, high efficiency, light-weight, low-cost GaAs shallow-homojunction solar cells for space application is demonstrated. This program addressed the optimal preparation of ultrathin GaAs single-crystal layers by AsCl3-GaAs-H2 and OMCVD process. Considerable progress has been made in both areas. Detailed studies on the AsCl3 process showed high-quality GaAs thin layers can be routinely grown. Later overgrowth of GaAs by OMCVD has been also observed and thin FaAs films were obtained from this process.

  18. Crystal growth of device quality GaAs in space

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.; Lagowski, J.

    1984-01-01

    The crystal growth, device processing and device related properties and phenomena of GaAs are investigated. Our GaAs research evolves about these key thrust areas. The overall program combines: (1) studies of crystal growth on novel approaches to engineering of semiconductor materials (i.e., GaAs and related compounds); (2) investigation and correlation of materials properties and electronic characteristics on a macro- and microscale; (3) investigation of electronic properties and phenomena controlling device applications and device performance. The ground based program is developed which would insure successful experimentation with and eventually processing of GaAs in a near zero gravity environment.

  19. Carbon doping of III-V compound semiconductors

    SciTech Connect

    Moll, Amy Jo

    1994-09-01

    Focus of the study is C acceptor doping of GaAs, since C diffusion coefficient is at least one order of magnitude lower than that of other common p-type dopants in GaAs. C ion implantation results in a concentration of free holes in the valence band < 10% of that of the implanted C atoms for doses > 1014/cm2. Rutherford backscattering, electrical measurements, Raman spectroscopy, and Fourier transform infrared spectroscopy were amonth the techniques used. Ga co-implantation increased the C activation in two steps: first, the additional radiation damage creates vacant As sites that the implanted C can occupy, and second, it maintains the stoichiometry of the implanted layer, reducing the number of compensating native defects. In InP, the behavior of C was different from that in GaAs. C acts as n-type dopant in the In site; however, its incorporation by implantation was difficult to control; experiments using P co-implants were inconsistent. The lattice position of inactive C in GaAs in implanted and epitaxial layers is discussed; evidence for formation of C precipitates in GaAs and InP was found. Correlation of the results with literature on C doping in III-V semiconductors led to a phenomenological description of C in III-V compounds (particularly GaAs): The behavior of C is controlled by the chemical nature of C and the instrinsic Fermi level stabilization energy of the material.

  20. Effect of variations in the doping profiles on the properties of doped multiple quantum well avalanche photodiodes

    NASA Technical Reports Server (NTRS)

    Menkara, H. M.; Wagner, B. K.; Summers, C. J.

    1996-01-01

    The purpose of this study is to use both theoretical and experimental evidence to determine the impact of doping imbalance and symmetry on the physical and electrical characteristics of doped multiple quantum well avalanche photodiodes (APD). Theoretical models have been developed to calculate the electric field valence and conduction bands, capacitance-voltage (CV), and carrier concentration versus depletion depth profiles. The models showed a strong correlation between the p- and n-doping balance inside the GaAs wells and the number of depleted stages and breakdown voltage of the APD. A periodic doping imbalance in the wells has been shown to result in a gradual increase (or decrease) in the electric field profile throughout the device which gave rise to partially depleted devices at low bias. The MQW APD structures that we modeled consisted of a 1 micron top p(+)-doped (3 x 10(exp 18) cm(exp -3)) GaAs layer followed by a 1 micron region of alternating layers of GaAs (500 A) and Al(0.42)Ga(0.58)As (500 A), and a 1 micron n(+) back layer (3 x 10(exp 18) cm(exp -3)). The GaAs wells were doped with p-i-n layers placed at the center of each well. The simulation results showed that in an APD with nine doped wells, and where the 50 A p-doped layer is off by 10% (p = 1.65 x 10(exp 18) cm(exp -3), n = 1.5 x 10(exp 18) cm(exp -3)), almost half of the MQW stages were shown to be undepleted at low bias which was a result of a reduction in the electric field near the p(+) cap layer by over 50% from its value in the balanced structure. Experimental CV and IV data on similar MBE grown MQW structures have shown very similar depletion and breakdown characteristics. The models have enabled us to better interpret our experimental data and to determine both the extent of the doping imbalances in the devices as well as the overall p- or n-type doping characteristics of the structures.

  1. Effect of defects due to lattice mismatch between GaAs and InP materials on gate-leakage current and microwave noise of GaAs MESFETS on InP substrates

    NASA Astrophysics Data System (ADS)

    Chertouk, Mourad; Boudiaf, A.; Azoulay, Rozette; Clei, A.

    1993-11-01

    The effect of traps due to lattice mismatch between GaAs and InP materials on the reverse current of Schottky diodes is demonstrated by the temperature dependence of the current, which exhibits a S.R.H. component at low reverse bias (also present in GaAs/GaAs with activation energy 0.125 eV) and a trap assisted tunneling one at high reverse bias (not observed in GaAs/GaAs). A model is developed which takes into account the temperature and channel doping level dependence. Application of this model to 0.25 micrometers gate GaAs MESFETs gives a good agreement with gate leakage current behavior as a function of drain and gate bias, for 6 X 1017 cm-3 and 1018 cm-3 channel doping. The excess gate-drain assisted tunneling current in 1018 cm-3 doped channel does not affect the MESFETs dc and microwave performances. However, the microwave noise (Fmin) is increased.

  2. Ruthenium related deep-level defects in n-type GaAs

    NASA Astrophysics Data System (ADS)

    Naz, Nazir A.; Qurashi, Umar S.; Majid, A.; Zafar Iqbal, M.

    2009-12-01

    Deep-level transient spectroscopy (DLTS) has been used to investigate deep levels in n-type Ru-doped GaAs grown by low-pressure metal-organic chemical-vapor deposition (LP-MOCVD). DLTS scans over a wide temperature range (12-470 K) reveal two prominent deep-level peaks associated with Ru, when compared with control samples with no deliberate Ru-doping. The well-known mid-gap defect EL2 is also observed in these scans. The Ru-related deep levels, Ru1 and Ru2, correspond to energy positions Ec-0.46 eV and Ec-0.57 eV in the upper-half-bandgap of GaAs. No prominent deep levels associated with Ru are observed in the lower half-bandgap in the injection DLTS spectra; only the three inadvertent levels already present in the as-grown, control material are observed in these spectra. Although a possible Ru-related peak may be present with a rather small concentration in these injection DLTS spectra, it is difficult to clearly identify this peak also present in the control (as-grown, without Ru) samples at a closely similar position. Interestingly, doping with Ru reveals an interesting significant suppression of the pre-existing deep levels, including EL2. Detailed emission rate signatures are presented for the Ru-related deep levels and analyzed to obtain the relevant deep-level characteristics. Both Ru1 and Ru2 are found to show strong dependence on electric field, as demonstrated by the shift in the corresponding DLTS peak positions with the applied reverse bias during electron emission.

  3. Carbon doped GaN buffer layer using propane for high electron mobility transistor applications: Growth and device results

    SciTech Connect

    Li, X.; Nilsson, D.; Danielsson, Ö.; Pedersen, H.; Janzén, E.; Forsberg, U.; Bergsten, J.; Rorsman, N.

    2015-12-28

    The creation of a semi insulating (SI) buffer layer in AlGaN/GaN High Electron Mobility Transistor (HEMT) devices is crucial for preventing a current path beneath the two-dimensional electron gas (2DEG). In this investigation, we evaluate the use of a gaseous carbon gas precursor, propane, for creating a SI GaN buffer layer in a HEMT structure. The carbon doped profile, using propane gas, is a two stepped profile with a high carbon doping (1.5 × 10{sup 18 }cm{sup −3}) epitaxial layer closest to the substrate and a lower doped layer (3 × 10{sup 16 }cm{sup −3}) closest to the 2DEG channel. Secondary Ion Mass Spectrometry measurement shows a uniform incorporation versus depth, and no memory effect from carbon doping can be seen. The high carbon doping (1.5 × 10{sup 18 }cm{sup −3}) does not influence the surface morphology, and a roughness root-mean-square value of 0.43 nm is obtained from Atomic Force Microscopy. High resolution X-ray diffraction measurements show very sharp peaks and no structural degradation can be seen related to the heavy carbon doped layer. HEMTs are fabricated and show an extremely low drain induced barrier lowering value of 0.1 mV/V, demonstrating an excellent buffer isolation. The carbon doped GaN buffer layer using propane gas is compared to samples using carbon from the trimethylgallium molecule, showing equally low leakage currents, demonstrating the capability of growing highly resistive buffer layers using a gaseous carbon source.

  4. Carbon doped GaN buffer layer using propane for high electron mobility transistor applications: Growth and device results

    NASA Astrophysics Data System (ADS)

    Li, X.; Bergsten, J.; Nilsson, D.; Danielsson, Ö.; Pedersen, H.; Rorsman, N.; Janzén, E.; Forsberg, U.

    2015-12-01

    The creation of a semi insulating (SI) buffer layer in AlGaN/GaN High Electron Mobility Transistor (HEMT) devices is crucial for preventing a current path beneath the two-dimensional electron gas (2DEG). In this investigation, we evaluate the use of a gaseous carbon gas precursor, propane, for creating a SI GaN buffer layer in a HEMT structure. The carbon doped profile, using propane gas, is a two stepped profile with a high carbon doping (1.5 × 1018 cm-3) epitaxial layer closest to the substrate and a lower doped layer (3 × 1016 cm-3) closest to the 2DEG channel. Secondary Ion Mass Spectrometry measurement shows a uniform incorporation versus depth, and no memory effect from carbon doping can be seen. The high carbon doping (1.5 × 1018 cm-3) does not influence the surface morphology, and a roughness root-mean-square value of 0.43 nm is obtained from Atomic Force Microscopy. High resolution X-ray diffraction measurements show very sharp peaks and no structural degradation can be seen related to the heavy carbon doped layer. HEMTs are fabricated and show an extremely low drain induced barrier lowering value of 0.1 mV/V, demonstrating an excellent buffer isolation. The carbon doped GaN buffer layer using propane gas is compared to samples using carbon from the trimethylgallium molecule, showing equally low leakage currents, demonstrating the capability of growing highly resistive buffer layers using a gaseous carbon source.

  5. GaAs IMPATT diodes for microstrip circuit applications.

    NASA Technical Reports Server (NTRS)

    Wisseman, W. R.; Tserng, H. Q.; Shaw, D. W.; Mcquiddy, D. N.

    1972-01-01

    GaAs IMPATT diodes with plated heat sinks are shown to be particularly well suited for microstrip circuit applications. Details of materials growth and device fabrication procedures are given, and experimental results are presented for a GaAs IMPATT microstrip oscillator operating at X band.

  6. Panel fabrication utilizing GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Mardesich, N.

    1984-01-01

    The development of the GaAs solar cells for space applications is described. The activities in the fabrication of GaAs solar panels are outlined. Panels were fabricated while introducing improved quality control, soldering laydown and testing procedures. These panels include LIPS II, San Marco Satellite, and a low concentration panel for Rockwells' evaluation. The panels and their present status are discussed.

  7. Optical and magnetotransport properties of InGaAs/GaAsSb/GaAs structures doped with a magnetic impurity

    SciTech Connect

    Kalentyeva, I. L. Zvonkov, B. N.; Vikhrova, O. V.; Danilov, Yu. A.; Demina, P. B.; Dorokhin, M. V.; Zdoroveyshchev, A. V.

    2015-11-15

    InGaAs/GaAsSb/GaAs bilayer quantum-well structures containing a magnetic-impurity δ-layer (Mn) at the GaAs/InGaAs interface are experimentally studied for the first time. The structures are fabricated by metal organic chemical-vapor deposition (MOCVD) and laser deposition on substrates of conducting (n{sup +}) and semi-insulating GaAs in a single growth cycle. The InGaAs-layer thickness is varied from 1.5 to 5 nm. The significant effect of a decrease in the InGaAs quantum-well thickness on the optical and magnetotransport properties of the structures under study is detected. Nonlinear magnetic-field dependence of the Hall resistance and negative magnetoresistance at temperatures of ≤30–40 K, circular polarization of the electroluminescence in a magnetic field, opposite behaviors of the photoluminescence and electroluminescence emission intensities in the structures, and an increase in the contribution of indirect transitions with decreasing InGaAs thickness are observed. Simulation shows that these effects can be caused by the influence of the δ-layer of acceptor impurity (Mn) on the band structure and the hole concentration distribution in the bilayer quantum well.

  8. Peeled film GaAs solar cell development

    NASA Technical Reports Server (NTRS)

    Wilt, D. M.; Thomas, R. D.; Bailey, S. G.; Brinker, D. J.; Deangelo, F. L.

    1990-01-01

    Thin-film, single-crystal gallium arsenide (GaAs) solar cells could exhibit a specific power approaching 700 W/kg including coverglass. A simple process has been described whereby epitaxial GaAs layers are peeled from a reusable substrate. This process takes advantage of the extreme selectivity of the etching rate of aluminum arsenide (AlAs) over GaAs in dilute hydrofluoric acid. The feasibility of using the peeled film technique to fabricate high-efficiency, low-mass GaAs solar cells is presently demonstrated. A peeled film GaAs solar cell was successfully produced. The device, although fractured and missing the aluminum gallium arsenide window and antireflective coating, had a Voc of 874 mV and a fill factor of 68 percent under AM0 illumination.

  9. Polarization and charge limit studies of strained GaAs photocathodes

    SciTech Connect

    Saez, P.J.

    1997-03-01

    This thesis presents studies on the polarization and charge limit behavior of electron beams produced by strained GaAs photocathodes. These photocathodes are the source of high-intensity, high-polarization electron beams used for a variety of high-energy physics experiments at the Stanford Linear Accelerator Center. Recent developments on P-type, biaxially-strained GaAs photocathodes have produced longitudinal polarization in excess of 80% while yielding beam intensities of {approximately} 2.5 A/cm{sup 2} at an operating voltage of 120 kV. The SLAC Gun Test Laboratory, which has a replica of the SLAC injector, was upgraded with a Mott polarimeter to study the polarization properties of photocathodes operating in a high-voltage DC gun. Both the maximum beam polarization and the maximum charge obtainable from these photocathodes have shown a strong dependence on the wavelength of illumination, on the doping concentration, and on the negative electron affinity levels. The experiments performed for this thesis included studying the effects of temperature, cesiation, quantum efficiency, and laser intensity on the polarization of high-intensity beams. It was found that, although low temperatures have been shown to reduce the spin relaxation rate in bulk semiconductors, they don`t have a large impact on the polarization of thin photocathodes. It seems that the short active region in thin photocathodes does not allow spin relaxation mechanisms enough time to cause depolarization. Previous observations that lower QE areas on the photocathode yield higher polarization beams were confirmed. In addition, high-intensity, small-area laser pulses were shown to produce lower polarization beams. Based on these results, together with some findings in the existing literature, a new proposal for a high-intensity, high-polarization photocathode is given. It is hoped that the results of this thesis will promote further investigation on the properties of GaAs photocathodes.

  10. Au impact on GaAs epitaxial growth on GaAs (111){sub B} substrates in molecular beam epitaxy

    SciTech Connect

    Liao, Zhi-Ming; Chen, Zhi-Gang; Xu, Hong-Yi; Guo, Ya-Nan; Sun, Wen; Zhang, Zhi; Yang, Lei; Lu, Zhen-Yu; Chen, Ping-Ping; Lu, Wei; Zou, Jin

    2013-02-11

    GaAs growth behaviour under the presence of Au nanoparticles on GaAs {l_brace}111{r_brace}{sub B} substrate is investigated using electron microscopy. It has been found that, during annealing, enhanced Ga surface diffusion towards Au nanoparticles leads to the GaAs epitaxial growth into {l_brace}113{r_brace}{sub B} faceted triangular pyramids under Au nanoparticles, governed by the thermodynamic growth, while during conventional GaAs growth, growth kinetics dominates, resulting in the flatted triangular pyramids at high temperature and the epitaxial nanowires growth at relatively low temperature. This study provides an insight of Au nanoparticle impact on GaAs growth, which is critical for understanding the formation mechanisms of semiconductor nanowires.

  11. Hole-Impeded-Doping-Superlattice LWIR Detectors

    NASA Technical Reports Server (NTRS)

    Maserjian, Joseph

    1991-01-01

    Hole-Impeded-Doping-Superlattice (HIDS) InAs devices proposed for use as photoconductive or photovoltaic detectors of radiation in long-wavelength infrared (LWIR) range of 8 to 17 micrometers. Array of HIDS devices fabricated on substrates GaAs or Si. Radiation incident on black surface, metal contacts for picture elements serve as reactors, effectively doubling optical path and thereby increasing absorption of photons. Photoconductive detector offers advantages of high gain and high impedance; photovoltaic detector offers lower noise and better interface to multiplexer readouts.

  12. Effects of surface reconstruction on the epitaxial growth of III-Sb on GaAs using interfacial misfit array

    NASA Astrophysics Data System (ADS)

    Jia, Bo Wen; Tan, Kian Hua; Loke, Wan Khai; Wicaksono, Satrio; Yoon, Soon Fatt

    2017-03-01

    The effects of pre-growth Sb reconstruction on a GaAs surface on the epitaxial growth of III-Sb (GaSb and InSb) on a (100) GaAs substrate using interfacial misfit array were investigated. All samples exhibited smooth surface with a root mean square (r.m.s.) roughness below 1.5 nm and nearly 100% relaxation. Modeling indicated that the distribution and types of misfit dislocations can be evaluated using a reciprocal space map (RSM) of the x-ray measurements. The interfacial misfit (IMF) arrays in III-Sb/GaAs samples were characterized by RSMs of high-resolution x-ray diffraction (XRD) and transmission electron microscopy (TEM). The RSM results suggest that all samples exhibited highly uniformly distributed misfit dislocations, and pre-growth (2 × 8) Sb surface reconstruction promoted the formation of 90° dislocations in an IMF array. Hall measurements of unintentionally doped GaSb and InSb layers also suggested that the highest motilities at both 77 K and 300 K were achieved at the samples grown on GaAs with pre-growth (2 × 8) Sb reconstruction.

  13. Airplane dopes and doping

    NASA Technical Reports Server (NTRS)

    Smith, W H

    1919-01-01

    Cellulose acetate and cellulose nitrate are the important constituents of airplane dopes in use at the present time, but planes were treated with other materials in the experimental stages of flying. The above compounds belong to the class of colloids and are of value because they produce a shrinking action on the fabric when drying out of solution, rendering it drum tight. Other colloids possessing the same property have been proposed and tried. In the first stages of the development of dope, however, shrinkage was not considered. The fabric was treated merely to render it waterproof. The first airplanes constructed were covered with cotton fabric stretched as tightly as possible over the winds, fuselage, etc., and flying was possible only in fine weather. The necessity of an airplane which would fly under all weather conditions at once became apparent. Then followed experiments with rubberized fabrics, fabrics treated with glue rendered insoluble by formaldehyde or bichromate, fabrics treated with drying and nondrying oils, shellac, casein, etc. It was found that fabrics treated as above lost their tension in damp weather, and the oil from the motor penetrated the proofing material and weakened the fabric. For the most part the film of material lacked durability. Cellulose nitrate lacquers, however were found to be more satisfactory under varying weather conditions, added less weight to the planes, and were easily applied. On the other hand, they were highly inflammable, and oil from the motor penetrated the film of cellulose nitrate, causing the tension of the fabric to be relaxed.

  14. Dyakonov-Perel Effect on Spin Dephasing in n-Type GaAs

    NASA Technical Reports Server (NTRS)

    Ning, C. Z.; Wu, M. W.

    2003-01-01

    A paper presents a study of the contribution of the Dyakonov-Perel (DP) effect to spin dephasing in electron-donor-doped bulk GaAs in the presence of an applied steady, moderate magnetic field perpendicular to the growth axis of the GaAs crystal. (The DP effect is an electron-wave-vector-dependent spin-state splitting of the conduction band, caused by a spin/orbit interaction in a crystal without an inversion center.) The applicable Bloch equations of kinetics were constructed to include terms accounting for longitudinal optical and acoustic phonon scattering as well as impurity scattering. The contributions of the aforementioned scattering mechanisms to spin-dephasing time in the presence of DP effect were examined by solving the equations numerically. Spin-dephasing time was obtained from the temporal evolution of the incoherently summed spin coherence. Effects of temperature, impurity level, magnetic field, and electron density on spin-dephasing time were investigated. Spin-dephasing time was found to increase with increasing magnetic field. Contrary to predictions of previous simplified treatments of the DP effect, spin-dephasing time was found to increase with temperature in the presence of impurity scattering. These results were found to agree qualitatively with results of recent experiments.

  15. GaAs VLSI for aerospace electronics

    NASA Technical Reports Server (NTRS)

    Larue, G.; Chan, P.

    1990-01-01

    Advanced aerospace electronics systems require high-speed, low-power, radiation-hard, digital components for signal processing, control, and communication applications. GaAs VLSI devices provide a number of advantages over silicon devices including higher carrier velocities, ability to integrate with high performance optical devices, and high-resistivity substrates that provide very short gate delays, good isolation, and tolerance to many forms of radiation. However, III-V technologies also have disadvantages, such as lower yield compared to silicon MOS technology. Achieving very large scale integration (VLSI) is particularly important for fast complex systems. At very short gate delays (less than 100 ps), chip-to-chip interconnects severely degrade circuit clock rates. Complex systems, therefore, benefit greatly when as many gates as possible are placed on a single chip. To fully exploit the advantages of GaAs circuits, attention must be focused on achieving high integration levels by reducing power dissipation, reducing the number of devices per logic function, and providing circuit designs that are more tolerant to process and environmental variations. In addition, adequate noise margin must be maintained to ensure a practical yield.

  16. Metalorganic molecular beam epitaxy growth of GaAs on patterned GaAs substrates

    NASA Astrophysics Data System (ADS)

    Marx, D.; Asahi, H.; Liu, X. F.; Okuno, Y.; Inoue, K.; Gonda, S.; Shimomura, S.; Hiyamizu, S.

    1994-03-01

    GaAs layers were grown on etch-patterned (100) GaAs substrates by MOMBE (metalorganic molecular beam epitaxy) using TEGa (triethylgallium) and thermally cracked TEAs (triethylarsine). Morphology and orientation dependencies of the grown facets on the growth temperature (400-630°C) and V/III ratio (2-4) are investigated. Good morphology of grown layers was obtained on (111)A side facets at a low V/III ratio of 3 and low growth temperatures of 450-500°C. We also found strong evidence that the formation of facets is not only governed by the migration of Ga precursors and/or Ga atoms, but also by a preferential catalytic decomposition of Ga precursors on the facet edges.

  17. Measuring the magnetic-field-dependent chemical potential of a low-density three-dimensional electron gas in n -GaAs and extracting its magnetic susceptibility

    NASA Astrophysics Data System (ADS)

    Roy Choudhury, Aditya N.; Venkataraman, V.

    2016-01-01

    We report the magnetic-field-dependent shift of the electron chemical potential in bulk, n -type GaAs at room temperature. A transient voltage of ˜100 μ V was measured across a Au-Al2O3 -GaAs metal-oxide-semiconductor capacitor in a pulsed magnetic field of ˜6 T . Several spurious voltages larger than the signal that had plagued earlier researchers performing similar experiments were carefully eliminated. The itinerant magnetic susceptibility of GaAs is extracted from the experimentally measured data for four different doping densities, including one as low as 5 ×1015cm-3 . Though the susceptibility in GaAs is dominated by Landau-Peierls diamagnetism, the experimental technique demonstrated can be a powerful tool for extracting the total free carrier magnetization of any electron system. The method is also virtually independent of the carrier concentration and is expected to work better in the nondegenerate limit. Such experiments had been successfully performed in two-dimensional electron gases at cryogenic temperatures. However, an unambiguous report on having observed this effect in any three-dimensional electron gas has been lacking. We highlight the 50 year old literature of various trials and discuss the key details of our experiment that were essential for its success. The technique can be used to unambiguously yield only the itinerant part of the magnetic susceptibility of complex materials such as magnetic semiconductors and hexaborides, and thus shed light on the origin of ferromagnetism in such systems.

  18. Towards low-cost high-efficiency GaAs photovoltaics and photoelectrodes grown via vapor transport from a solid source

    SciTech Connect

    Boucher, Jason; Ritenour, Andrew; Boettcher, Shannon W.

    2013-04-29

    Towards low-cost high-efficiency GaAs photovoltaics and photoelectrodes grown via vapor transport from a solid source GaAs is an attractive material for thin-film photovoltaic applications, but is not widely used for terrestrial power generation due to the high cost of metal-organic chemical vapor deposition (MOCVD) techniques typically used for growth. Close space vapor transport is an alternative that allows for rapid growth rates of III-V materials, and does not rely on the toxic and pyrophoric precursors used in MOCVD. We characterize CSVT films of GaAs using photoelectrochemical current-voltage and quantum efficiency measurements. Hole diffusion lengths which exceed 1.5 um are extracted from internal quantum efficiency measurements using the Gartner model. Device physics simulations suggest that solar cells based on these films could reach efficiencies exceeding 24 %. To reach this goal, a more complete understanding of the electrical properties and characterization of defects will be necessary, including measurements on complete solid-state devices. Doping of films is achieved by using source material containing the desired impurity (e.g., Te or Zn). We discuss strategies for growing III-V materials on inexpensive substrates that are not lattice-matched to GaAs.

  19. GaAs Surface Passivation for Device Applications.

    DTIC Science & Technology

    1982-07-01

    Protective Layers AlAs GaAs InAs As III-V AlSb GaSb InSb Sb AIP GaP InP P ZnS CdS HgS S II-Vi ZnSe CdSe HgSe Se ZnTe CdTe HgTe Te Ternaries and Quaternaries...D 4- 4- C 0331 IUMe ’xO. C .- 0. Z 00 919 . 23 3. Bulk GaAs Samples Several Bridgman grown bulk GaAs (100) samples were utilized for MIS and XPS

  20. Adding GaAs Monolayers to InAs Quantum-Dot Lasers on (001) InP

    NASA Technical Reports Server (NTRS)

    Qiu, Yueming; Chacon, Rebecca; Uhl, David; Yang, Rui

    2005-01-01

    In a modification of the basic configuration of InAs quantum-dot semiconductor lasers on (001)lnP substrate, a thin layer (typically 1 to 2 monolayer thick) of GaAs is incorporated into the active region. This modification enhances laser performance: In particular, whereas it has been necessary to cool the unmodified devices to temperatures of about 80 K in order to obtain lasing at long wavelengths, the modified devices can lase at wavelengths of about 1.7 microns or more near room temperature. InAs quantum dots self-assemble, as a consequence of the lattice mismatch, during epitaxial deposition of InAs on ln0.53Ga0.47As/lnP. In the unmodified devices, the quantum dots as thus formed are typically nonuniform in size. Strainenergy relaxation in very large quantum dots can lead to poor laser performance, especially at wavelengths near 2 microns, for which large quantum dots are needed. In the modified devices, the thin layers of GaAs added to the active regions constitute potential-energy barriers that electrons can only penetrate by quantum tunneling and thus reduce the hot carrier effects. Also, the insertion of thin GaAs layer is shown to reduce the degree of nonuniformity of sizes of the quantum dots. In the fabrication of a batch of modified InAs quantum-dot lasers, the thin additional layer of GaAs is deposited as an interfacial layer in an InGaAs quantum well on (001) InP substrate. The device as described thus far is sandwiched between InGaAsPy waveguide layers, then further sandwiched between InP cladding layers, then further sandwiched between heavily Zn-doped (p-type) InGaAs contact layer.

  1. Rapid thermal anneal in InP, GaAs and GaAs/GaAlAs

    NASA Astrophysics Data System (ADS)

    Descouts, B.; Duhamel, N.; Godefroy, S.; Krauz, P.

    Ion implantation in semiconductors provides a doping technique with several advantages over more conventional doping methods and is now extensively used for device applications, e.g. field effect transistors (MESFET GaAs, MIS (InP), GaAs/GaAlAs heterojunction bipolar transistors (HBT). Because of the lattice disorder produced by the implantation, the dopant must be made electrically active by a postimplant anneal. As the device performances are very dependent on its electrical characteristics, the anneal is a very important stage of the process. Rapid anneal is known to provide less exodiffusion and less induffusion of impurities compared to conventional furnace anneal, so this technique has been used in this work to activate an n-type dopant (Si) in InP and a p-type dopant (Mg) in GaAs and GaAs/GaAIAs. These two ions have been chosen to realize implanted MIS InP and the base contacts for GaAs/GaAlAs HBTs. The experimental conditions to obtain the maximum electrical activity in these two cases will be detailed. For example, although we have not been able to obtain a flat profile in Mg + implanted GaAs/GaAlAs heterostructure by conventional thermal anneal, rapid thermal anneal gives a flat hole profile over a depth of 0.5 μm with a concentration of 1 x 10 19 cm -3.

  2. Manipulable wave-vector filtering in a δ-doped magnetic-barrier nanostructure

    NASA Astrophysics Data System (ADS)

    Liu, Yu; Zhang, Lan-Lan; Lu, Mao-Wang; Zhou, Yong-Long; Li, Fei

    2017-03-01

    We theoretically explore the control of the wave-vector filtering (WVF) effect in a realistic magnetic-barrier nanostructure with a δ -doping, which can be experimentally realized by depositing a ferromagnetic stripe on the top of a GaAs /AlxGa1-x As heterostructure. It is shown that an obvious WVF effect still exists when a δ-doping is introduced into the device. It is also shown that the degree of the WVF effect can be controlled by tuning the weight and/or the position of the δ-doping.

  3. Development of GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Mcnally, P. J.

    1972-01-01

    Calculations of GaAs solar cell output parameters were refined and a computer model was developed for parameter optimization. The results were analyzed to determine the material characteristics required for a high efficiency solar cell. Calculated efficiencies for a P/N cell polarity are higher than an N/P cell. Both cell polarities show efficiency to have a larger dependence on short circuit current than an open circuit voltage under nearly all conditions considered. The tolerances and requirements of a cell fabrication process are more critical for an N/P type than for a P/N type cell. Several solar cell fabrication considerations relative to junction formation using ion implantation are also discussed.

  4. Nitrogen-concentration control in GaNAs/AlGaAs quantum wells using nitrogen δ-doping technique

    SciTech Connect

    Mano, Takaaki; Jo, Masafumi; Kuroda, Takashi; Noda, Takeshi; Sugimoto, Yoshimasa; Sakuma, Yoshiki; Elborg, Martin; Sakoda, Kazuaki

    2014-05-15

    GaNAs/Al{sub 0.35}Ga{sub 0.65}As multiple quantum wells (MQWs) with nitrogen δ-doping were fabricated on GaAs (100) substrates by plasma-assisted molecular beam epitaxy. High controllability of nitrogen-concentrations in the MQWs was achieved by tuning nitrogen δ-doping time. The maximum nitrogen concentration in the MQWs was 2.8%. The MQWs exhibit intense, narrow photoluminescence emission.

  5. GaAs monolithic RF modules for SARSAT distress beacons

    NASA Technical Reports Server (NTRS)

    Cauley, Michael A.

    1991-01-01

    Monolithic GaAs UHF components for use in SARSAT Emergency Distress beacons are under development by Microwave Monolithics, Inc., Simi Valley, CA. The components include a bi-phase modulator, driver amplifier, and a 5 watt power amplifier.

  6. More About V-Grooved GaAs Solar Cells

    NASA Technical Reports Server (NTRS)

    Bailey, S. G.; Wilt, D. M.; Landis, G. A.; Thomas, R. D.; Fatemi, N.

    1993-01-01

    NASA technical memorandum presents additional information about experimental devices described in "V-Grooved GaAs Solar Cell" (LEW-14954). Experimental V-groove cells exhibited improved optical coupling and greater short-circuit current.

  7. Interfacial Ga-As suboxide: Structural and electronic properties

    SciTech Connect

    Colleoni, Davide Pasquarello, Alfredo

    2015-07-20

    The structural and electronic properties of Ga-As suboxide representative of the transition region at the GaAs/oxide interface are studied through density functional calculations. Two amorphous models generated by quenches from the melt are taken under consideration. The absence of As–O bonds indicates that the structure is a mixture of GaAs and Ga-oxide, in accordance with photoemission experiments. The band edges of the models are found to be closely aligned to those of GaAs. The simulation of charging and discharging processes leads to the identification of an As-related defect with an energy level at ∼0.7 eV above the GaAs valence band maximum, in good agreement with the experimental density of interface states.

  8. Enhanced annealing of GaAs solar cell radiation damage

    NASA Technical Reports Server (NTRS)

    Loo, R.; Knechtli, R. C.; Kamath, G. S.

    1981-01-01

    Solar cells are degraded by radiation damage in space. Investigations have been conducted concerning possibilities for annealing this radiation damage in GaAs solar cells, taking into account the conditions favoring such annealing. It has been found that continuous annealing as well as the combination of injection annealing with thermal annealing can lead to recovery from radiation damage under particularly favorable conditions in GaAs solar cells. The damage caused by both electrons and protons in GaAs solar cells can be substantially reduced by annealing at temperatures as low as 150 C, under appropriate conditions. This possibility makes the GaAs solar cells especially attractive for long space missions, or for missions in severe radiation environments. Attention is given to results concerning periodic thermal annealing, continuous annealing, and injection annealing combined with thermal annealing.

  9. GaAs Films Prepared by RF-Magnetron Sputtering

    SciTech Connect

    L.H. Ouyang; D.L. Rode; T. Zulkifli; B. Abraham-Shrauner; N. Lewis; M.R. Freeman

    2001-08-01

    The authors reported on the optical absorption, adhesion, and microstructure of RF-magnetron sputtered films of hydrogenated amorphous and microcrystalline GaAs films for the 1 to 25 {micro}m infrared wavelength rate. Sputtering parameters which were varied include sputtering power, temperature and pressure, and hydrogen sputtering-gas concentration. TEM results show a sharp transition from purely amorphous GaAs to a mixture of microcrystalline GaAs in an amorphous matrix at 34 {+-} 2 C. By optimizing the sputtering parameters, the optical absorption coefficient can be decreased below 100 cm{sup -1} for wavelengths greater than about 1.25 {micro}m. These results represent the lowest reported values of optical absorption for sputtered films of GaAs directly measured by spectrophotometry for the near-infrared wavelength region.

  10. Characteristics of GaAs with inverted thermal conversion

    NASA Technical Reports Server (NTRS)

    Kang, C. H.; Lagowski, J.; Gatos, H. C.

    1987-01-01

    GaAs crystals exhibiting inverted thermal conversion (ITC) of resistivity were investigated in conjunction with standard semiinsulating (SI) GaAs regarding characteristics important in device processing. It was established that dislocation density and Si implant activation are unaffected by transformation to the ITC state. However, in ITC GaAs the controlled increase of the EL2 (native midgap donor) concentration during annealing makes it possible to attain resistivities one order of magnitude greater (e.g., about 10 to the 9th ohm cm of 300 K) than those attained in standard SI GaAs (e.g., 10 to the 7th-10 to the 8th ohm cm).

  11. Crystal growth of device quality GaAs in space

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.; Lagowski, J.

    1983-01-01

    GaAs device technology has recently reached a new phase of rapid advancement, made possible by the improvement of the quality of GaAs bulk crystals. At the same time, the transition to the next generation of GaAs integrated circuits and optoelectronic systems for commercial and government applications hinges on new quantum steps in three interrelated areas: crystal growth, device processing and device-related properties and phenomena. Special emphasis is placed on the establishment of quantitative relationships among crystal growth parameters-material properties-electronic properties and device applications. The overall program combines studies of crystal growth on novel approaches to engineering of semiconductor material (i.e., GaAs and related compounds); investigation and correlation of materials properties and electronic characteristics on a macro- and microscale; and investigation of electronic properties and phenomena controlling device applications and device performance.

  12. Crystal Growth of Device Quality Gaas in Space

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.

    1985-01-01

    The GaAs research evolves about these key thrust areas. The overall program combines: (1) studies of crystal growth on novel approaches to engineering of semiconductor material (i.e., GaAs and related compounds); (2) investigation and correlation of materials properties and electronic characteristics on a macro- and microscale; and (3) investigation of electronic properties and phenomena controlling device applications and device performance. This effort is aimed at the essential ground-based program which would insure successful experimentation with and eventually processing of GaAs in near zero gravity environment. It is believed that this program addresses in a unique way materials engineering aspects which bear directly on the future exploitation of the potential of GaAs and related materials in device and systems applications.

  13. Preparation of GaAs photocathodes at low temperature

    SciTech Connect

    Mulhollan, G.; Clendenin, J.; Tang, H.

    1996-10-01

    The preparation of an atomically clean surface is a necessary step in the formation of negative electron affinity (NEA) GaAs. Traditional methods to this end include cleaving, heat cleaning and epitaxial growth. Cleaving has the advantage of yielding a fresh surface after each cleave, but is limited to small areas and is not suitable for specialized structures. Heat cleaning is both simple and highly successful, so it is used as a preparation method in virtually all laboratories employing a NEA source on a regular basis. Due to its high cost and complexity, epitaxial growth of GaAs with subsequent in vacuo transfer is not a practical solution for most end users of GaAs as a NEA electron source. While simple, the heating cleaning process has a number of disadvantages. Here, a variety of cleaning techniques related to preparation of an atomically clean GaAs surface without heating to 600 C are discussed and evaluated.

  14. Spatial Modulation Of Light In GaAs

    NASA Technical Reports Server (NTRS)

    Cheng, Li-Jen; Gheen, Gregory; Partovi, Afshin

    1989-01-01

    Spatial modulation of light in gallium arsenide demonstrated by transferring image from one of two coherent, crossing beams of light to other one. Technique relies on cross-polarization beam coupling, product of photorefractive effect in GaAs crystal.

  15. Air Force development of thin GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Masloski, K.

    1982-01-01

    The advantages of gallium arsenide (GaAs) over silicon (Si) type solar cells are well documented. However, two major disadvantages are weight and cost. Several ideas have recently surfaced that, if successful, will diminish these disadvantages. The CLEFT peeled film technique and the galicon cell are two of the more promising approaches. Low weight, low cost, high efficiency GaAs solar cell research is summarized.

  16. Anisotropic transport in modulation-doped quantum-well structures

    NASA Technical Reports Server (NTRS)

    Radulescu, D. C.; Wicks, G. W.; Schaff, W. J.; Calawa, A.R.; Eastman, L. F.

    1987-01-01

    Anisotropic electron transport has been observed in GaAs modulation-doped quantum wells grown by molecular-beam epitaxy on a thick (001) Al(0.3)Ga(0.7)As buffer grown at 620 C. Thicker quantum wells (150, 200, and 300 A) show progressively less anisotropy, which vanishes for a 300-A quantum well. The degree of anisotropy is also reduced or eliminated by suspending growth of the Al(0.3)Ga(0.7)As for a period of 300 s prior to growing the GaAs quantum well. Growing the Al(0.3)Ga(0.7)As buffer at higher temperatures (680 C) also reduces the degree of anisotropy. Higher two-dimensional electron gas sheet densities result in less anisotropy.The anisotropy is eliminated by replacing the thick Al(0.3)Ga(0.7)As buffer with a periodic multilayer structure comprising 15 A of GaAs and 200 A of Al(0.3)Ga(0.7)As. The degree of anisotropy is related to the thickness and growth parameters of the Al(0.3)Ga(0.7)As layer grown just prior to the growth of the GaAs.

  17. AlGaN/GaN high electron mobility transistors with intentionally doped GaN buffer using propane as carbon precursor

    NASA Astrophysics Data System (ADS)

    Bergsten, Johan; Li, Xun; Nilsson, Daniel; Danielsson, Örjan; Pedersen, Henrik; Janzén, Erik; Forsberg, Urban; Rorsman, Niklas

    2016-05-01

    AlGaN/GaN high electron mobility transistors (HEMTs) fabricated on a heterostructure grown by metalorganic chemical vapor deposition using an alternative method of carbon (C) doping the buffer are characterized. C-doping is achieved by using propane as precursor, as compared to tuning the growth process parameters to control C-incorporation from the gallium precursor. This approach allows for optimization of the GaN growth conditions without compromising material quality to achieve semi-insulating properties. The HEMTs are evaluated in terms of isolation and dispersion. Good isolation with OFF-state currents of 2 × 10-6 A/mm, breakdown fields of 70 V/µm, and low drain induced barrier lowering of 0.13 mV/V are found. Dispersive effects are examined using pulsed current-voltage measurements. Current collapse and knee walkout effects limit the maximum output power to 1.3 W/mm. With further optimization of the C-doping profile and GaN material quality this method should offer a versatile approach to decrease dispersive effects in GaN HEMTs.

  18. Design and optimization of very high power density monochromatic GaAs photovoltaic cells

    SciTech Connect

    Algora, C.; Diaz, V.

    1998-09-01

    This paper deals with the structure optimization of very high power density monochromatic GaAs photovoltaic cells and the theoretical prediction of their performance at irradiances ranging from 0.1 to 100 W/cm{sup 2}. A multifaceted optimum design including the front metal grid, device size and the semiconductor layer structure is presented. The variation in efficiency depending on emitter thickness, base thickness, emitter doping and base doping is also addressed. The objective of this being the configuration of a structure suitable for working up to 100 W/cm{sup 2} without the detrimental influence of series resistance. For this, a detailed analysis of the effect of series resistance and the quantitative determination of its different components is carried out. The optimum wavelength is 830 nm at 300 K for all the analyzed light intensities, in which a 63% peak efficiency under an irradiance of 100 W/cm{sup 2} for a p/n structure is obtained. The temperature effect on device performance in the 273--350 K range is also studied. Finally, the influence of device processing is analyzed.

  19. InAs/GaAs and InAs doping superlattices

    NASA Technical Reports Server (NTRS)

    Grunthaner, Frank J.; Hancock, Bruce R.; Maserjian, Joseph

    1990-01-01

    The extension of the optical response of narrow band gap III-V semiconductors into the long wavelength infrared radiation (LWIR) regime for high sensitivity sensor applications is a challenging problem. Recent advances in nipi doped GaAs superlattices, lattice mismatched epitaxy and the heteroepitaxial growth of III-V compound semiconductors on silicon substrates offer a number of opportunities. Researchers describe two different device approaches based on the molecular beam epitaxy (MBE) growth of superlattice materials which are directed to LWIR focal plane array technology. The first of these uses nipi superlattices fabricated in bulk InAs which has been grown on either GaAs or Si substrates. The second is based on the growth of a new pseudomorphic tetragonal phase of InAs on GaAs to create a semimetal/semiconductor superlattice material.

  20. Defect studies of Vanadium doped 4H-SiC using optical admittance spectroscopy

    NASA Astrophysics Data System (ADS)

    Lee, Wonwoo

    2005-03-01

    Semi-insulating SiC is an excellent candidate for a variety of applications, including microwave FET's and other devices for high power and high temperature applications. Vanadium acts as an amphoteric impurity in 4H-SiC with a V^3+/4+ acceptor level thought to be within 1 eV of the conduction band edge and a V^4+/5+ donor level known to be 1.6 eV below the conduction band edge. Vanadium is an efficient carrier trap and recombination center. We have studied vanadium doped 4H-SiC with the optical admittance spectroscopy (OAS) at room temperature. After taking into account phonon-assisted optical transitions, the estimated threshold energies can be compared with defect levels measured using thermal techniques. Compared with data reported in the literature, our results show that the defect level Ec -1.5 eV is close to the vanadium donor level and the other level Ec -0.67 eV is within the range of the value attributed to the vanadium acceptor level.

  1. Spectroscopy of GaAs quantum wells

    SciTech Connect

    West, L.C.

    1985-07-01

    A new type of optical dipole transition in GaAs quantum wells has been observed. The dipole occurs between two envelope states of the conduction band electron wavefunction, and is called a quantum well envelope state transition (QWEST). The QWEST is observed by infrared absorption in three different samples with quantum well thicknesses 65, 82, and 92 A and resonant energies of 152, 121, and 108 MeV, respectively. The oscillator strength is found to have values of over 12, in good agreement with prediction. The linewidths are seen as narrow as 10 MeV at room temperature and 7 MeV at low temperature, thus proving a narrow line resonance can indeed occur between transitions of free electrons. Techniques for the proper growth of these quantum well samples to enable observation of the QWEST have also been found using (AlGa)As compounds. This QWEST is considered to be an ideal material for an all optical digital computer. The QWEST can be made frequency matched to the inexpensive Carbon Dioxide laser with an infrared wavelength of 10 microns. The nonlinearity and fast relaxation time of the QWEST indicate a logic element with a subpicosecond switch time can be built in the near future, with a power level which will eventually be limited only by the noise from a lack of quanta to above approximately 10 microwatts. 64 refs., 35 figs., 6 tabs.

  2. Effect of doping on room temperature carrier escape mechanisms in InAs/GaAs quantum dot p-i-n junction photovoltaic cells

    NASA Astrophysics Data System (ADS)

    Sellers, D. G.; Chen, E. Y.; Polly, S. J.; Hubbard, S. M.; Doty, M. F.

    2016-05-01

    We investigate the effect of doping on the mechanisms of carrier escape from intermediate states in delta-doped InAs/GaAs intermediate band solar cells. The intermediate states arise from InAs quantum dots embedded in a GaAs p-i-n junction cell. We find that doping the sample increases the number of excited-state carriers participating in a cycle of trapping and carrier escape via thermal, optical, and tunneling mechanisms. However, we find that the efficiency of the optically-driven carrier escape mechanism is independent of doping and remains small.

  3. Vertical zone melt growth of GaAs

    SciTech Connect

    Henry, R.L.; Nordquist, P.E.R.; Gorman, R.J.

    1993-12-31

    A Vertical Zone Melt (VZM) technique has been applied to the single crystal growth of GaAs. A pyrolytic boron nitride crucible and a (100) oriented seed were used along with liquid encapsulation by boric oxide. In the case of GaAs, the ampoule was pressurized with either argon or argensic vapor from elemental arsenic at pressures ranging from 1 to 2 atmospheres. A molten zone length of 22 mm gave a growth interface which is nearly flat and resulted in routine single crystal growth. Temperature gradients of 4{degrees}C/cm. and 9{degrees}C/cm. have produced dislocation densities of <1000/cm{sup 2} and 2000-5000/cm{sup 2} respectively for 34 mm diameter crystals of GaAs. Post growth cooling rates for GaAs have been 35, 160 and 500{degrees}C/hr. The cooling rate has been found to affect the number and size of arsenic precipitates and the EL2 concentration in the GaAs crystal. The effects of these and other growth parameters on the crystalline perfection and electrical properties of the crystals will be discussed.

  4. Step energy and step interactions on the reconstructed GaAs(001) surface

    NASA Astrophysics Data System (ADS)

    Magri, Rita; Gupta, Sanjeev K.; Rosini, Marcello

    2014-09-01

    Using ab initio total energy calculations we have studied the relation between the step atomic configuration and its properties (step energy, donor/acceptor behavior, and step interaction) on a β2(2×4) reconstructed GaAs (001) surface. The results have been tested against the widely used elastic dipole model for the step energy and step interaction considered valid for stress-free surfaces. We have found that acceptor-behaving steps have an attractive interaction and donor-behaving steps have a repulsive interaction in contrast with the elastic dipole model which predicts always a repulsive interaction between like-oriented steps. To account for the attractive interaction we consider the electrostatic dipole interaction having the L-2 scaling with the step distance L and therefore compatible with the standard elastic model. Using a model charge distribution with localized point charges at the step based on the electron counting model we show that the electrostatic step interaction can indeed be generally attractive and of the same order of magnitude of the negative elastic dipole interaction. Our results show however that the usually employed dipole model is unable to account for the repulsive/attractive step interaction between donorlike/acceptorlike steps. Therefore, the ab initio results suggest an important electronic contribution to the step interaction, at least at the short step distances accessible to the first-principles study. Our results explain qualitatively many experimental observations and provide an explanation to the step bunching phenomenon on GaAs(001) induced by doping or by critical growth conditions as due to the stabilization of attractively interacting step structures. These ideas would lead to the development of a bottom-up surface step engineering.

  5. 46 CFR Sec. 7 - Operation under current GAA/MSTS Southeast Asia Program.

    Code of Federal Regulations, 2010 CFR

    2010-10-01

    ... 46 Shipping 8 2010-10-01 2010-10-01 false Operation under current GAA/MSTS Southeast Asia Program... AUTHORITY VOYAGE DATA Sec. 7 Operation under current GAA/MSTS Southeast Asia Program. In order to adapt the provisions of NSA Order 35 (OPR-2) to the particular circumstances of the present GAA/MSTS Southeast...

  6. 46 CFR Sec. 7 - Operation under current GAA/MSTS Southeast Asia Program.

    Code of Federal Regulations, 2011 CFR

    2011-10-01

    ... 46 Shipping 8 2011-10-01 2011-10-01 false Operation under current GAA/MSTS Southeast Asia Program... AUTHORITY VOYAGE DATA Sec. 7 Operation under current GAA/MSTS Southeast Asia Program. In order to adapt the provisions of NSA Order 35 (OPR-2) to the particular circumstances of the present GAA/MSTS Southeast...

  7. INTERNATIONAL CONFERENCE ON SEMICONDUCTOR INJECTION LASERS SELCO-87: Multilayer CrPtCr/NiAu ohmic contacts with p-type GaAs in heterojunction laser structures

    NASA Astrophysics Data System (ADS)

    Wójcik, I.; Stareev, G.; Barcz, A.; Domański, M.

    1988-11-01

    Multilayer CrPtCr/NiAu metallization was deposited by sputtering in a magnetron on the p-type side of GaAs in a pulsed laser heterostructure. Heat treatment at 490 °C for 3 min produced a reliable ohmic contact with a specific resistance of 10- 6-10- 5 Ω · cm2, depending on the substrate doping. Secondary-ion mass spectroscopy and Rutherford backscattering methods were used to study the mechanism of formation of a contact.

  8. InGaAsN Solar Cells with 1.0eV Bandgap, Lattice Matched to GaAs

    SciTech Connect

    Allerman, A.A.; Banas, J.J.; Gee, J.M.; Hammons, B.E.; Jones, E.D.; Kurtz, S.R.

    1998-11-24

    The design, growth by metal-organic chemical vapor deposition, and processing of an In{sub 0.07}Ga{sub 0.93}As{sub 0.98}N{sub 0.02} solar Al, with 1.0 ev bandgap, lattice matched to GaAs is described. The hole diffusion length in annealed, n-type InGaAsN is 0.6-0.8 pm, and solar cell internal quantum efficiencies > 70% arc obwined. Optical studies indicate that defects or impurities, from InGAsN doping and nitrogen incorporation, limit solar cell performance.

  9. Transient GaAs plasmonic metasurfaces at terahertz frequencies

    SciTech Connect

    Yang, Yuanmu; Kamaraju, N.; Campione, Salvatore; Liu, Sheng; Reno, John L.; Sinclair, Michael B.; Prasankumar, Rohit P.; Brener, Igal

    2016-12-09

    Here we demonstrate the ultrafast formation of terahertz (THz) metasurfaces through all-optical creation of spatially modulated carrier density profiles in a deep-subwavelength GaAs film. The switch-on of the transient plasmon mode, governed by the GaAs effective electron mass and electron–phonon interactions, is revealed by structured-optical pump THz probe spectroscopy, on a time scale of 500 fs. By modulating the carrier density using different pump fluences, we observe a wide tuning of the electric dipole resonance of the transient GaAs metasurface from 0.5 THz to 1.7 THz. Furthermore, we numerically demonstrate that the metasurface presented here can be generalized to more complex architectures for realizing functionalities such as perfect absorption, leading to a 30 dB modulation depth. In conclusion, the platform also provides a pathway to achieve ultrafast manipulation of infrared beams in the linear and, potentially, nonlinear regime.

  10. Shallow-homojunction GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Fan, J. C. C.

    1979-01-01

    Single-crystal GaAs shallow-homojunction solar cells on GaAs or Ge substrates, without Ga sub 1-x Al sub x As window layers, that have conversion efficiencies exceeding 20% at AM1 (17% at AMO). Using a simple theoretical model, good fits were obtained between computer calculations and experimental data for external quantum efficiency and conversion efficiency of cells with different values of n+ layer thickness. The calculations not only yield values for material properties of the GaAs layers composing the cells but will also permit the optimization of cell designs for space and terrestrial applications. Preliminary measurements indicate that the shallow-homojunction cells are resistant to electron irradiation. In the best test so far, bombardment with 1 x 10 to the 16th power/sq cm fluence of 1 MeV electrons reduced the short-circuit current by only about 6%.

  11. Heterojunction photovoltaics using GaAs nanowires and conjugated polymers.

    PubMed

    Ren, Shenqiang; Zhao, Ni; Crawford, Samuel C; Tambe, Michael; Bulović, Vladimir; Gradecak, Silvija

    2011-02-09

    We demonstrate an organic/inorganic solar cell architecture based on a blend of poly(3-hexylthiophene) (P3HT) and narrow bandgap GaAs nanowires. The measured increase of device photocurrent with increased nanowire loading is correlated with structural ordering within the active layer that enhances charge transport. Coating the GaAs nanowires with TiO(x) shells passivates nanowire surface states and further improves the photovoltaic performance. We find that the P3HT/nanowire cells yield power conversion efficiencies of 2.36% under white LED illumination for devices containing 50 wt % of TiO(x)-coated GaAs nanowires. Our results constitute important progress for the use of nanowires in large area solution processed hybrid photovoltaic cells and provide insight into the role of structural ordering in the device performance.

  12. Biomimetic subwavelength antireflective gratings on GaAs.

    PubMed

    Sun, Chih-Hung; Ho, Brian J; Jiang, Bin; Jiang, Peng

    2008-10-01

    We have developed a simple and scalable bottom-up approach for fabricating moth-eye antireflective coatings on GaAs substrates. Monolayer, non-close-packed silica colloidal crystals are created on crystalline GaAs wafers by a spin-coating-based single-layer reduction technique. These colloidal monolayers can be used as etching masks during a BCl(3) dry-etch process to generate subwavelength-structured antireflective gratings directly on GaAs substrates. The gratings exhibit excellent broadband antireflective properties, and the specular reflection matches with the theoretical prediction using a rigorous coupled-wave analysis model. These bioinspired antireflection coatings have important technological applications ranging from efficient solar cells to IR detectors.

  13. A GaAs phononic crystal with shallow noncylindrical holes.

    PubMed

    Petrus, Joseph A; Mathew, Reuble; Stotz, James A H

    2014-02-01

    A square lattice of shallow, noncylindrical holes in GaAs is shown to act as a phononic crystal (PnC) reflector. The holes are produced by wet-etching a GaAs substrate using a citric acid:H2O2 etching procedure and a photolithographed array pattern. Although nonuniform and asymmetric etch rates limit the depth and shape of the phononic crystal holes, the matrix acts as a PnC, as demonstrated by insertion loss measurements together with interferometric imaging of surface acoustic waves propagating on the GaAs surface. The measured vertical displacement induced by surface phonons compares favorably with finite-difference time-domain simulations of a PnC with rounded-square holes.

  14. Characterization of production GaAs solar cells for space

    NASA Technical Reports Server (NTRS)

    Anspaugh, B. E.

    1988-01-01

    The electrical performance of GaAs solar cells was characterized as a function of irradiation with protons and electrons with the underlying goal of producing solar cells suitable for use in space. Proton energies used varied between 50 keV and 10 MeV, and damage coefficients were derived for liquid phase epitaxy GaAs solar cells. Electron energies varied between 0.7 and 2.4 MeV. Cells from recent production runs were characterized as a function of electron and proton irradiation. These same cells were also characterized as a function of solar intensity and operating temperature, both before and after the electron irradiations. The long term stability of GaAs cells during photon exposure was examined. Some cells were found to degrade with photon exposure and some did not. Calibration standards were made for GaAs/Ge solar cells by flight on a high altitude balloon.

  15. Microwave GaAs Integrated Circuits On Quartz Substrates

    NASA Technical Reports Server (NTRS)

    Siegel, Peter H.; Mehdi, Imran; Wilson, Barbara

    1994-01-01

    Integrated circuits for use in detecting electromagnetic radiation at millimeter and submillimeter wavelengths constructed by bonding GaAs-based integrated circuits onto quartz-substrate-based stripline circuits. Approach offers combined advantages of high-speed semiconductor active devices made only on epitaxially deposited GaAs substrates with low-dielectric-loss, mechanically rugged quartz substrates. Other potential applications include integration of antenna elements with active devices, using carrier substrates other than quartz to meet particular requirements using lifted-off GaAs layer in membrane configuration with quartz substrate supporting edges only, and using lift-off technique to fabricate ultrathin discrete devices diced separately and inserted into predefined larger circuits. In different device concept, quartz substrate utilized as transparent support for GaAs devices excited from back side by optical radiation.

  16. Studies of electron spin in GaAs quantum dots

    NASA Astrophysics Data System (ADS)

    Craft, Daniel; Colton, John; Park, Tyler; White, Phil

    2013-03-01

    We have studied electron spins in GaAs quantum dots with a pump-probe technique that normally yields the T1 spin lifetime, the time required for initially polarized electrons to relax and randomize. Using a circularly polarized laser tuned to the wavelength response of the quantum dot we can ``pump'' the spins into alignment. After aligning the spins we can detect them using a second, linearly polarized ``probe'' laser. By changing the delay between the two lasers we can trace out the spin response over time. In contrast with other samples (bulk GaAs and a GaAs quantum well), where the spin response decayed exponentially with time, initial data on the quantum dots has shown an unexpected, oscillating behavior which dies out on the order of 700 ns, independent of both temperature and magnetic field.

  17. Crystal growth of device quality GaAs in space

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.; Lagowski, J.

    1985-01-01

    The present program has been aimed at solving the fundamental and technological problems associated with Crystal Growth of Device Quality in Space. The initial stage of the program was devoted strictly to ground-based research. The unsolved problems associated with the growth of bulk GaAs in the presence of gravitational forces were explored. Reliable chemical, structural and electronic characterization methods were developed which would permit the direct relation of the salient materials parameters (particularly those affected by zero gravity conditions) to the electronic characteristics of single crystal GaAs, in turn to device performance. These relationships are essential for the development of optimum approaches and techniques. It was concluded that the findings on elemental semiconductors Ge and Si regarding crystal growth, segregation, chemical composition, defect interactions, and materials properties-electronic properties relationships are not necessarily applicable to GaAs (and to other semiconductor compounds). In many instances totally unexpected relationships were found to prevail.

  18. High efficiency thin-film GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Zwerdling, S.; Wang, K. L.; Yeh, Y. C. M.

    1981-01-01

    The paper demonstrates the feasibility of producing high-efficiency GaAs solar cells with high power-to-weight ratios by organic metallic chemical vapor deposition (OM-CVD) growth of thin epi-layers on suitable substrates. An AM1 conversion efficiency of 18% (14% AM0), or 17% (13% AM0) with a 5% grid coverage is achieved for a single-crystal GaAs n(+)/p cell grown by OM-CVD on a Ge wafer. Thin GaAs epi-layers OM-CVD grown can be fabricated with good crystallographic quality using a Si-substrate on which a thin Ge epi-interlayer is first deposited by CVD from GeH4 and processed for improved surface morphology

  19. Boron, bismuth co-doping of gallium arsenide and other compounds for photonic and heterojunction bipolar transistor devices

    DOEpatents

    Mascarenhas, Angelo

    2015-07-07

    Isoelectronic co-doping of semiconductor compounds and alloys with acceptors and deep donors is sued to decrease bandgap, to increase concentration of the dopant constituents in the resulting alloys, and to increase carrier mobilities lifetimes. For example, Group III-V compounds and alloys, such as GaAs and GaP, are isoelectronically co-doped with, for example, B and Bi, to customize solar cells, and other semiconductor devices. Isoelectronically co-doped Group II-VI compounds and alloys are also included.

  20. Giant magnetoresistance in a two-dimensional electron gas modulated by magnetic barriers and the δ-doping

    NASA Astrophysics Data System (ADS)

    Zhang, Lan-Lan; Lu, Mao-Wang; Yang, Shi-Peng; Tang, Qiang

    2016-10-01

    We theoretically investigate the modulation of the δ-doping to a semiconductor-based giant magnetoresistance (GMR) device, which can be realized experimentally by depositing two parallel ferromagnetic (FM) stripes on top and bottom of a GaAs /AlxGa1-xAs heterostructure. It is shown that a considerable GMR effect still exists in this device with the δ-doping. It is also shown that the magnetoresistance ratio (MR) depends on not only the weight but also the position of the δ-doping. These interesting results will be useful in understanding and designing structurally-controllable GMR devices for magnetic information storage.

  1. Local Structures and Interface Morphology of InGaAsN Thin Films Grown on GaAs

    SciTech Connect

    Allerman, A.A.; Chen, J.G.; Geisz, J.F.; Huang, S.; Hulbert, S.L.; Jones, E.D.; Kao, Y.H.; Kurtz, S.; Kurtz, S.R.; Olson, J.M.; Soo, Y.L.

    1999-02-23

    The compound semiconductor system InGaAsN exhibits many intriguing properties which are particularly useful for the development of innovative high efficiency thin film solar cells and long wavelength lasers. The bandgap in these semiconductors can be varied by controlling the content of N and In and the thin films can yet be lattice-matched to GaAs. In the present work, x-ray absorption fine structure (XAFS) and grazing incidence x-ray scattering (GIXS) techniques have been employed to probe the local environment surrounding both N and In atoms as well as the interface morphology of InGaAsN thin films epitaxially grown on GaAs. The soft x-ray XAFS results around nitrogen K-edge reveal that N is in the sp{sup 3} hybridized bonding configuration in InGaAsN and GaAsN, suggesting that N impurities most likely substitute for As sites in these two compounds. The results of In K-edge XAFS suggest a possible trend of a slightly larger coordination number of As nearest neighbors around In atoms in InGaAsN samples with a narrower bandgap whereas the In-As interatomic distance remains practically the same as in InAs within the experimental uncertainties. These results combined suggest that N-substitution of the As sites plays an important role of bandgap-narrowing while in the meantime counteracting the compressive strain caused by In-doping. Grazing incidence x-ray scattering (GIXS) experiments verify that InGaAsN thin films can indeed form very smooth interfaces with GaAs yielding an average interfacial roughness of 5-20{angstrom}.

  2. Atomic Structure of the Stoichiometric GaAs(114) Surface.

    PubMed

    Márquez; Kratzer; Geelhaar; Jacobi; Scheffler

    2001-01-01

    The stoichiometric GaAs(114) surface has been prepared using molecular beam epitaxy followed by annealing in ultrahigh vacuum. Based on in situ scanning tunneling microscopy measurements and first-principles electronic-structure calculations, we determine the surface reconstruction which we call alpha2(2x1). Contrary to what is expected for a high-index surface, it is surprisingly elementary. The (2x1) unit cell contains two As dimers and two rebonded Ga atoms. The surface energy is calculated as 53 meV/Å(2), which falls well within the range of low-index GaAs surface energies.

  3. Modelling of interband transitions in GaAs tunnel diode

    NASA Astrophysics Data System (ADS)

    Louarn, K.; Fontaine, C.; Arnoult, A.; Olivié, F.; Lacoste, G.; Piquemal, F.; Bounouh, A.; Almuneau, G.

    2016-06-01

    In this paper, an improved model for non-local band-to-band tunneling carrier transport is presented and compared to experimental measurement from GaAs tunnel junctions devices. By carefully taking into account the coupling between the conduction band and the light holes valence band, the model is able to predict, with realistic material parameters, the amplitude of the current density throughout the whole tunneling regime. The model suggests that elastic band-to-band tunneling instead of trap-assisted-tunneling is the predominant mechanism in GaAs tunnel junctions, which is of great interest for better understanding and improving III-V multi-junction solar cells.

  4. GaAs solar cells with V-grooved emitters

    NASA Technical Reports Server (NTRS)

    Bailey, S. G.; Fatemi, N.; Wilt, D. M.; Landis, G. A.; Thomas, R. D.

    1989-01-01

    A GaAs solar cell with a V-grooved front surface is described. It shows improved optical coupling and higher short-circuit current compared to planar cells. The GaAs homojunction cells, manufactured by OrganoMetallic Chemical Vapor Deposition (OMCVD), are described. The V-grooves were formed by anisotropic etching. Reflectivity measurements show significantly lower reflectance for the microgrooved cell compared to the planar structure. The short circuit current of the V-grooved solar cell is consistently higher than that of the planar controls.

  5. Experience with OMCVD production of GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Yeh, Y. C. M.; Iles, P. A.; Ho, P.; Ling, K. S.

    1985-01-01

    The projected promise of the OMCVD approach, i.e., to make high efficiency GaAs space cells, has been demonstrated. The properties and control of the deposited GaAs and AlGaAs layers and the uniformity of the post layer processing have been most satisfactory. In particular the control of the critical thin layers (p-GaAs, p-AlGaAs) has been impressive. Experience has also been gained in routine areas, connected with continuous operation at high capacity. There are still a few areas for improvement, to further increase capacity, and to anticipate and prevent mechanical equipment problems.

  6. Peeled film GaAs solar cells for space power

    NASA Technical Reports Server (NTRS)

    Wilt, D. M.; Deangelo, F. L.; Thomas, R. D.; Bailey, S. G.; Landis, G. A.; Brinker, D. J.; Fatemi, N. S.

    1990-01-01

    Gallium arsenide (GaAs) peeled film solar cells were fabricated, by Organo-Metallic Vapor Phase Epitaxy (OMVPE), incorporating an aluminum arsenide (AlAs) parting layer between the device structure and the GaAs substrate. This layer was selectively removed by etching in dilute hydrofloric (HF) acid to release the epitaxial film. Test devices exhibit high series resistance due to insufficient back contact area. A new design is presented which uses a coverglass superstrate for structural support and incorporates a coplanar back contact design. Devices based on this design should have a specific power approaching 700 W/Kg.

  7. Investigation of high efficiency GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Olsen, Larry C.; Dunham, Glen; Addis, F. W.; Huber, Dan; Linden, Kurt

    1989-01-01

    Investigations of basic mechanisms which limit the performance of high efficiency GaAs solar cells are discussed. P/N heteroface structures have been fabricated from MOCVD epiwafers. Typical AM1 efficiencies are in the 21 to 22 percent range, with a SERI measurement for one cell being 21.5 percent. The cells are nominally 1.5 x 1.5 cm in size. Studies have involved photoresponse, T-I-V analyses, and interpretation of data in terms of appropriate models to determine key cell parameters. Results of these studies are utilized to determine future approaches for increasing GaAs solar cell efficiencies.

  8. Simple intrinsic defects in GaAs : numerical supplement.

    SciTech Connect

    Schultz, Peter Andrew

    2012-04-01

    This Report presents numerical tables summarizing properties of intrinsic defects in gallium arsenide, GaAs, as computed by density functional theory. This Report serves as a numerical supplement to the results published in: P.A. Schultz and O.A. von Lilienfeld, 'Simple intrinsic defects in GaAs', Modelling Simul. Mater. Sci Eng., Vol. 17, 084007 (2009), and intended for use as reference tables for a defect physics package in device models. The numerical results for density functional theory calculations of properties of simple intrinsic defects in gallium arsenide are presented.

  9. Electronic contribution to friction on GaAs

    SciTech Connect

    Applied Science and Technology Graduate Group, UC Berkeley; Dept. of Materials Sciences and Engineering, UC Berkeley; Salmeron, Miquel; Qi, Yabing; Park, J.Y.; Hendriksen, B.L.M.; Ogletree, D.F.; Salmeron, Miquel

    2008-04-15

    The electronic contribution to friction at semiconductor surfaces was investigated by using a Pt-coated tip with 50nm radius in an atomic force microscope sliding against an n-type GaAs(100) substrate. The GaAs surface was covered by an approximately 1 nm thick oxide layer. Charge accumulation or depletion was induced by the application of forward or reverse bias voltages. We observed a substantial increase in friction force in accumulation (forward bias) with respect to depletion (reverse bias). We propose a model based on the force exerted by the trapped charges that quantitatively explains the experimental observations of excess friction.

  10. High efficiency thin-film GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Stirn, R. J.

    1977-01-01

    Several oxidation techniques are discussed which have been found to increase the open circuit (V sub oc) of metal-GaAs Schottky barrier solar cells, the oxide chemistry, attempts to measure surface state parameters, the evolving characteristics of the solar cell as background contamination (has been decreased, but not eliminated), results of focused Nd/YAG laser beam recrystallization of Ge films evaporated onto tungsten, and studies of AMOS solar cells fabricated on sliced polycrystalline GaAs wafers. Also discussed are projected materials availability and costs for GaAs thin-film solar cells.

  11. Defect interactions in GaAs single crystals

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.; Lagowski, J.

    1984-01-01

    The two-sublattice structural configuration of GaAs and deviations from stoichiometry render the generation and interaction of electrically active point defects (and point defect complexes) critically important for device applications and very complex. Of the defect-induced energy levels, those lying deep into the energy band are very effective lifetime ""killers". The level 0.82 eV below the condition band, commonly referred to as EL2, is a major deep level, particularly in melt-grown GaAs. This level is associated with an antisite defect complex (AsGa - VAS). Possible mechanisms of its formation and its annihilation were further developed.

  12. Crystal growth of GaAs in space

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.; Lagowski, J.; Pawlowicz, L. M.; Dabkowski, F.; Li, C. J.

    1984-01-01

    It is shown that stoichiometry variations in the GaAs melt during growth constitute the most critical parameter regarding defect formations and their interactions; this defect structure determines all relevant characteristics of GaAs. Convection in the melt leads to stoichiometric variations. Growth in axial magnetic fields reduces convection and permits the study of defect structure. In order to control stoichiometry in space and to accommodate expansion during solidification, a partially confined configuration was developed. A triangular prism is employed to contain the growth melt. This configuration permits the presence of the desired vapor phase in contact with the melt for controlling the melt stoichiometry.

  13. MBE Growth of GaAs Whiskers on Si Nanowires

    NASA Astrophysics Data System (ADS)

    Maxwell Andrews, Aaron; Klang, Pavel; Detz, Hermann; Lugstein, Alois; Schramböck, Matthias; Steinmair, Mathias; Hyun, Youn-Joo; Bertagnolli, Emmerich; Müller, Thomas; Unterrainer, Karl; Schrenk, Werner; Strasser, Gottfried

    2010-01-01

    We present the growth of GaAs nanowhiskers by molecular beam epitaxy on Si (111) nanowires grown by low-pressure chemical vapor deposition. The whiskers grow in the wurtzite phase, along the [0001] direction, on the {112} facets of the Si nanowire, forming a star-like six-fold radial symmetry. The photoluminescence shows a 30 meV blue shift with respect to bulk GaAs, additionally a GaAs/AlAs core-shell heterostructure shows increased luminescence.

  14. Impact of the modulation doping layer on the ν = 5/2 anisotropy

    DOE PAGES

    Shi, X.; Pan, W.; Baldwin, K. W.; ...

    2015-03-30

    We have carried out a systematic study of the tilted magnetic field induced anisotropy at the Landau level filling factor ν = 5/2 in a series of high quality GaAs quantum wells, where the setback distance (d) between the modulation doping layer and the GaAs quantum well is varied from 33 to 164 nm. We have observed that in the sample of the smallest d, electronic transport is anisotropic when the in-plane magnetic field (Bip) is parallel to the [1–10] crystallographic direction, but remains more or less isotropic when Bip // [110]. In contrast, in the sample of largest d,more » electronic transport is anisotropic in both crystallographic directions. Lastly, our results clearly show that the modulation doping layer plays an important role in the tilted field induced ν = 5/2 anisotropy.« less

  15. Impact of the modulation doping layer on the ν = 5/2 anisotropy

    SciTech Connect

    Shi, X.; Pan, W.; Baldwin, K. W.; West, K. W.; Pfeiffer, L. N.; Tsui, D. C.

    2015-03-30

    We have carried out a systematic study of the tilted magnetic field induced anisotropy at the Landau level filling factor ν = 5/2 in a series of high quality GaAs quantum wells, where the setback distance (d) between the modulation doping layer and the GaAs quantum well is varied from 33 to 164 nm. We have observed that in the sample of the smallest d, electronic transport is anisotropic when the in-plane magnetic field (Bip) is parallel to the [1–10] crystallographic direction, but remains more or less isotropic when Bip // [110]. In contrast, in the sample of largest d, electronic transport is anisotropic in both crystallographic directions. Lastly, our results clearly show that the modulation doping layer plays an important role in the tilted field induced ν = 5/2 anisotropy.

  16. Inversion-mode GaAs wave-shaped field-effect transistor on GaAs (100) substrate

    SciTech Connect

    Zhang, Jingyun; Si, Mengwei; Wu, Heng; Ye, Peide D.; Lou, Xiabing; Gordon, Roy G.; Shao, Jiayi; Manfra, Michael J.

    2015-02-16

    Inversion-mode GaAs wave-shaped metal-oxide-semiconductor field-effect transistors (WaveFETs) are demonstrated using atomic-layer epitaxy of La{sub 2}O{sub 3} as gate dielectric on (111)A nano-facets formed on a GaAs (100) substrate. The wave-shaped nano-facets, which are desirable for the device on-state and off-state performance, are realized by lithographic patterning and anisotropic wet etching with optimized geometry. A well-behaved 1 μm gate length GaAs WaveFET shows a maximum drain current of 64 mA/mm, a subthreshold swing of 135 mV/dec, and an I{sub ON}/I{sub OFF} ratio of greater than 10{sup 7}.

  17. Structure of high-index GaAs surfaces - the discovery of the stable GaAs(2511) surface

    NASA Astrophysics Data System (ADS)

    Jacobi, K.; Geelhaar, L.; Márquez, J.

    We present a brief overview of surface structures of high-index GaAs surfaces, putting emphasis on recent progress in our own laboratory. By adapting a commercial scanning tunneling microscope (STM) to our molecular beam epitaxy and ultra high vacuum analysis chamber system, we have been able to atomically resolve the GaAs( {1} {1} {3})B(8 ×1), (114)Aα2(2×1), (137), (3715), and (2511) surface structures. In cooperation with P. Kratzer and M. Scheffler from the Theory Department of the Fritz-Haber Institute we determined the structure of some of these surfaces by comparing total-energy calculations and STM image simulations with the atomically resolved STM images. We present the results for the {112}, {113}, and {114} surfaces. Then we describe what led us to proceed into the inner parts of the stereographic triangle and to discover the hitherto unknown stable GaAs(2511) surface.

  18. Photoelectrical characteristics of as-grown highresistance GaAs single crystals

    NASA Astrophysics Data System (ADS)

    Budnitskii, D. L.; Koretskaya, O. B.; Tolbanov, O. P.; Tyazhev, A. V.

    2010-06-01

    The electrophysical and photoelectrical properties of high-resistance GaAs produced by single crystal growth are studied and analyzed. The electron (τ n ) and hole (τ p ) lifetimes are estimated. The charge-carrier lifetimes are compared in as-grown and diffusion high-resistance GaAs. The conclusion is made that in high-resistance GaAs produced by chromium diffusion, the charge-carrier recombination mechanism qualitatively differs from that in as-grown GaAs. The charge-carrier recombination in diffusion GaAs is determined by the occurrence of recombination barriers due to chromium diffusion.

  19. Towards low-cost high-efficiency GaAs photovoltaics and photoelectrodes grown via vapor transport from a solid source

    NASA Astrophysics Data System (ADS)

    Boucher, Jason W.; Ritenour, Andrew J.; Boettcher, Shannon W.

    2013-05-01

    GaAs is an attractive material for thin-film photovoltaic applications, but is not widely used for terrestrial power generation due to the high cost of metal-organic chemical vapor deposition (MOCVD) techniques typically used for growth. Close space vapor transport is an alternative that allows for rapid growth rates of III-V materials, and does not rely on the toxic and pyrophoric precursors used in MOCVD. We characterize CSVT films of GaAs using photoelectrochemical current-voltage and quantum efficiency measurements. Hole diffusion lengths which exceed 1.5 μm are extracted from internal quantum efficiency measurements using the Gärtner model. Device physics simulations suggest that solar cells based on these films could reach efficiencies exceeding 24%. To reach this goal, a more complete understanding of the electrical properties and characterization of defects will be necessary, including measurements on complete solid-state devices. Doping of films is achieved by using source material containing the desired impurity (e.g., Te or Zn). We discuss strategies for growing III-V materials on inexpensive substrates that are not lattice-matched to GaAs.

  20. Discrimination between energy transfer and back transfer processes for GaAs host and Er luminescent dopants using electric response analysis

    SciTech Connect

    Ishii, Masashi; Koizumi, Atsushi; Fujiwara, Yasufumi; Takeda, Yoshikazu

    2014-04-07

    The energy transfer and back transfer processes of GaAs co-doped with Er and O (GaAs:Er,O) were experimentally distinguished by using a frequency response analysis of the AC photocurrent. The results were achieved by using the difference in the frequency dispersion between (1) the dispersion of the energy transfer, which is triggered by the trapping of free charges in the GaAs host and is represented with the Debye relaxation response and (2) the dispersion of the energy back transfer, which is induced by non-radiative transition of 4f bound electrons in the Er dopants and is described with a Lorentzian. The Debye relaxation response found in GaAs:Er,O provided a charge trapping time that was dependent on temperature, which was well correlated with the thermal quenching property of intense intra-4f-shell luminescence. The spectral shape of the Lorentzian dependence on the temperature was explained with the thermal excitation of Er 4f electrons and release of trapped charges in GaAs. The thermal excitation and release of charges consistently explained the characteristics of weak 4f luminescence in low- and high-temperature regions, respectively.

  1. Electronic properties of GaAs, InAs and InP nanowires studied by terahertz spectroscopy.

    PubMed

    Joyce, Hannah J; Docherty, Callum J; Gao, Qiang; Tan, H Hoe; Jagadish, Chennupati; Lloyd-Hughes, James; Herz, Laura M; Johnston, Michael B

    2013-05-31

    We have performed a comparative study of ultrafast charge carrier dynamics in a range of III-V nanowires using optical pump-terahertz probe spectroscopy. This versatile technique allows measurement of important parameters for device applications, including carrier lifetimes, surface recombination velocities, carrier mobilities and donor doping levels. GaAs, InAs and InP nanowires of varying diameters were measured. For all samples, the electronic response was dominated by a pronounced surface plasmon mode. Of the three nanowire materials, InAs nanowires exhibited the highest electron mobilities of 6000 cm² V⁻¹ s⁻¹, which highlights their potential for high mobility applications, such as field effect transistors. InP nanowires exhibited the longest carrier lifetimes and the lowest surface recombination velocity of 170 cm s⁻¹. This very low surface recombination velocity makes InP nanowires suitable for applications where carrier lifetime is crucial, such as in photovoltaics. In contrast, the carrier lifetimes in GaAs nanowires were extremely short, of the order of picoseconds, due to the high surface recombination velocity, which was measured as 5.4 × 10⁵  cm s⁻¹. These findings will assist in the choice of nanowires for different applications, and identify the challenges in producing nanowires suitable for future electronic and optoelectronic devices.

  2. Electronic and magnetic properties of N-N split substitution in GaAs: A hybrid density functional study

    SciTech Connect

    Huang, Ruiqi; Wang, Qingxia; Cai, Xiaolin; Li, Chong; Jia, Yu; Wang, Fei; Wang, Sanjun

    2015-07-15

    Employing the first-principles combined with hybrid functional calculations, the electronic and magnetic properties of GaAs doped with a N{sub 2} molecule are investigated in this work. We find that in Ga{sub 32}As{sub 31}(N{sub 2}){sub As} the N-N split is able to saturate the dangling bond of Ga atom ,form sp{sup 3}-like hybridization, and simultaneously supply an extra localized electron, leading to a magnetic ground state with a magnetic moment of ∼1μ{sub B}. This magnetic ground state is different from previously nonmagnetic results predicted by PBE functional, which results from the self-interaction error inherent in semi-local density functional theory. Moreover, the band gap of magnetic ground state of Ga{sub 32}As{sub 31}(N{sub 2}){sub As} alloy decreases, which is relative to GaAs . Finally we discuss and explain why the magnetism is not discovered in previous experiments and theories.

  3. Gallium arsenide (GaAs) island growth under SiO(2) nanodisks patterned on GaAs substrates.

    PubMed

    Tjahjana, Liliana; Wang, Benzhong; Tanoto, Hendrix; Chua, Soo-Jin; Yoon, Soon Fatt

    2010-05-14

    We report a growth phenomenon where uniform gallium arsenide (GaAs) islands were found to grow underneath an ordered array of SiO(2) nanodisks on a GaAs(100) substrate. Each island eventually grows into a pyramidal shape resulting in the toppling of the supported SiO(2) nanodisk. This phenomenon occurred consistently for each nanodisk across a large patterned area of approximately 50 x 50 microm(2) (with nanodisks of 210 nm diameter and 280 nm spacing). The growth mechanism is attributed to a combination of 'catalytic' growth and facet formation.

  4. Present status of GaAs. [including space processing and solid state applications

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.; Lagowski, J.; Jastrzebski, L.

    1979-01-01

    An extensive literature survey on GaAs was carried out for the period December 31, 1970, to December 31, 1977. The increasing interest in GaAs device structures increased steadily during that period. The leading research and development centers and the specific areas of interest were identified. A workshop on GaAs was held in November 1977 to assess the present status of melt-grown GaAs and the existing needs for reliable chemical, structural, and electronic characterization methods. It was concluded that the present available bulk GaAs crystals are of poor quality and that GaAs technology is lagging demonstrated or potentially feasible GaAs devices and systems.

  5. Distinguishing impurity concentrations in GaAs and AlGaAs using very shallow undoped heterostructures

    NASA Astrophysics Data System (ADS)

    Mak, W. Y.; Das Gupta, K.; Beere, H. E.; Farrer, I.; Sfigakis, F.; Ritchie, D. A.

    2010-12-01

    We have developed a method of fabricating very shallow, gateable, undoped two-dimensional electron gases (2DEG) and making very low resistivity contacts to these. We studied the evolution of mobility as a function of the depth of the 2DEG (from 310 to 30 nm). We extract quantitative information about the background impurity concentrations in GaAs and AlGaAs, the interface roughness, and the charge in the surface states. Surface charge sets an intrinsic limit to the mobility of very shallow 2DEGs. It is probably impossible to fabricate such shallow high-mobility 2DEGs using modulation doping due to the need to accommodate a spacer layer.

  6. ZnSe Films in GaAs Solar Cells

    NASA Technical Reports Server (NTRS)

    Kachare, Ram H.

    1987-01-01

    ZnSe increases efficiency and conserves material. Two proposed uses of zinc selenide films promise to boost performance and reduce cost of gallium arsenide solar cells. Accordingly ZnSe serves as surface-passivation layer and as sacrificial layer enabling repeated use of costly GaAs substrate in fabrication.

  7. Measuring Carrier Lifetime in GaAs by Luminescence

    NASA Technical Reports Server (NTRS)

    Von Roos, O.

    1986-01-01

    Luminescence proposed as nondestructive technique for measuring Shockley-Read-Hall (SRH) recombination lifetime GaAs. Sample irradiated, and luminescence escapes through surface. Measurement requires no mechanical or electrical contact with sample. No ohmic contacts or p/n junctions needed. Sample not scrapped after tested.

  8. The 20 GHz power GaAs FET development

    NASA Technical Reports Server (NTRS)

    Crandell, M.

    1986-01-01

    The development of power Field Effect Transistors (FET) operating in the 20 GHz frequency band is described. The major efforts include GaAs FET device development (both 1 W and 2 W devices), and the development of an amplifier module using these devices.

  9. V-Grooved GaAs Solar Cell

    NASA Technical Reports Server (NTRS)

    Bailey, S. G.; Landis, G. R.; Wilt, D. M.; Thomas, R. D.; Arrison, A.; Fatemi, N. S.

    1991-01-01

    V-grooved GaAs solar photovoltaic cells increase optical coupling and greater conversion of light into electricity. Increases both trapping of incident light and lengths of optical paths in cell material. Net effect increases in total absorptivity, tolerance to damage by energetic particles, and short-circuit current. These improvements expected to follow from similar improvements obtained in silicon solar cells.

  10. GaAs Photovoltaics on Polycrystalline Ge Substrates

    NASA Technical Reports Server (NTRS)

    Wilt, David M.; Pal, AnnaMaria T.; McNatt, Jeremiah S.; Wolford, David S.; Landis, Geoffrey A.; Smith, Mark A.; Scheiman, David; Jenkins, Phillip P.; McElroy Bruce

    2007-01-01

    High efficiency III-V multijunction solar cells deposited on metal foil or even polymer substrates can provide tremendous advantages in mass and stowage, particularly for planetary missions. As a first step towards that goal, poly-crystalline p/i/n GaAs solar cells are under development on polycrystalline Ge substrates. Organo Metallic Vapor Phase Epitaxy (OMVPE) parameters for pre-growth bake, nucleation and deposition have been examined. Single junction p/i/n GaAs photovoltaic devices, incorporating InGaP front and back window layers, have been grown and processed. Device performance has shown a dependence upon the thickness of a GaAs buffer layer deposited between the Ge substrate and the active device structure. A thick (2 m) GaAs buffer provides for both increased average device performance as well as reduced sensitivity to variations in grain size and orientation. Illumination under IR light (lambda > 1 micron), the cells showed a Voc, demonstrating the presence of an unintended photoactive junction at the GaAs/Ge interface. The presence of this junction limited the efficiency to approx.13% (estimated with an anti-refection coating) due to the current mismatch and lack of tunnel junction interconnect.

  11. CLEFT Process for GaAs Solar Cells

    NASA Technical Reports Server (NTRS)

    Fan, J. C. C.; Bozler, C. O.; Mcclelland, R. W.

    1983-01-01

    CLEFT (cleavage of lateral epitaxial films for transfer) process involves growing ultrathin gallium arsenide (GaAs solar cell on much thicker layer of same material). Growth method is completed solar cell easily separated by cleaving from much thicker substrate. Thick substrate is reusable in making additional cells, which reduces cell material cost.

  12. Status of GaAs solar cell production

    NASA Technical Reports Server (NTRS)

    Yeh, Milton; Ho, Frank; Iles, Peter A.

    1989-01-01

    Recent experience in producing GaAs solar cells, to meet the full requirements of space-array manufacturers is reviewed. The main problems have been in extending MOCVD technology to provide high throughput of high quality epitaxial layers, and to integrate the other important factors needed to meet the full range of user requirements. Some discussion of evolutionary changes is also given.

  13. Gallium arsenide (GaAs) power conversion concept

    NASA Technical Reports Server (NTRS)

    Nussberger, A. A.

    1980-01-01

    A summary design analysis of a GaAs power conversion system for the solar power satellite (SPS) is presented. Eight different satellite configuration options for the solar arrays are compared. Solar cell annealing effects after proton irradiation are considered. Mass estimates for the SPS and the effect of solar cell parameters on SPS array design are discussed.

  14. Ballistic thermal point contacts made of GaAs nanopillars

    SciTech Connect

    Bartsch, Th.; Wetzel, A.; Sonnenberg, D.; Schmidt, M.; Heyn, Ch.; Hansen, W.

    2013-12-04

    We measure the thermal conductance of GaAs pillars that are only a few nanometers long. Our observations can be understood with a simple model, in which the pillars constitute thermal point contacts between 3D phonon reservoirs. Moreover, first measurements of the electronic transport through these pillars are presented.

  15. High purity, low dislocation GaAs single crystals

    NASA Technical Reports Server (NTRS)

    Chen, R. T.; Holmes, D. E.; Kirkpatrick, C. G.

    1983-01-01

    Liquid encapsulated Czochralski crystal growth techniques for producing undoped, high resistivity, low dislocation material suitable for device applications is described. Technique development resulted in reduction of dislocation densities in 3 inch GaAs crystals. Control over the melt stoichiometry was determined to be of critical importance for the reduction of twinning and polycrystallinity during growth.

  16. Fermi energy tuning with light to control doping profiles during epitaxy

    SciTech Connect

    Sanders, C. E.; Beaton, D. A.; Reedy, R. C.; Alberi, K.

    2015-05-04

    The influence of light stimulation and photogenerated carriers on the process of dopant surface segregation during growth is studied in molecular beam epitaxially grown Si-doped GaAs structures. The magnitude of surface segregation decreases under illumination by above-bandgap photons, wherein splitting of the quasi Fermi levels reduces the band bending at the growth surface and raises the formation energy of compensating defects that can enhance atomic diffusion. We further show that light-stimulated epitaxy can be used as a practical approach to diminish dopant carry-forward in device structures and improve the performance of inverted modulation-doped quantum wells.

  17. Visualization of carrier dynamics in p(n)-type GaAs by scanning ultrafast electron microscopy.

    PubMed

    Cho, Jongweon; Hwang, Taek Yong; Zewail, Ahmed H

    2014-02-11

    Four-dimensional scanning ultrafast electron microscopy is used to investigate doping- and carrier-concentration-dependent ultrafast carrier dynamics of the in situ cleaved single-crystalline GaAs(110) substrates. We observed marked changes in the measured time-resolved secondary electrons depending on the induced alterations in the electronic structure. The enhancement of secondary electrons at positive times, when the electron pulse follows the optical pulse, is primarily due to an energy gain involving the photoexcited charge carriers that are transiently populated in the conduction band and further promoted by the electron pulse, consistent with a band structure that is dependent on chemical doping and carrier concentration. When electrons undergo sufficient energy loss on their journey to the surface, dark contrast becomes dominant in the image. At negative times, however, when the electron pulse precedes the optical pulse (electron impact), the dynamical behavior of carriers manifests itself in a dark contrast which indicates the suppression of secondary electrons upon the arrival of the optical pulse. In this case, the loss of energy of material's electrons is by collisions with the excited carriers. These results for carrier dynamics in GaAs(110) suggest strong carrier-carrier scatterings which are mirrored in the energy of material's secondary electrons during their migration to the surface. The approach presented here provides a fundamental understanding of materials probed by four-dimensional scanning ultrafast electron microscopy, and offers possibilities for use of this imaging technique in the study of ultrafast charge carrier dynamics in heterogeneously patterned micro- and nanostructured material surfaces and interfaces.

  18. Highly doped silicon nanowires by monolayer doping.

    PubMed

    Veerbeek, Janneke; Ye, Liang; Vijselaar, Wouter; Kudernac, Tibor; van der Wiel, Wilfred G; Huskens, Jurriaan

    2017-02-23

    Controlling the doping concentration of silicon nanostructures is challenging. Here, we investigated three different monolayer doping techniques to obtain silicon nanowires with a high doping dose. These routes were based on conventional monolayer doping, starting from covalently bound dopant-containing molecules, or on monolayer contact doping, in which a source substrate coated with a monolayer of a carborane silane was the dopant source. As a third route, both techniques were combined to retain the benefits of conformal monolayer formation and the use of an external capping layer. These routes were used for doping fragile porous nanowires fabricated by metal-assisted chemical etching. Differences in porosity were used to tune the total doping dose inside the nanowires, as measured by X-ray photoelectron spectroscopy and secondary ion mass spectrometry measurements. The higher the porosity, the higher was the surface available for dopant-containing molecules, which in turn led to a higher doping dose. Slightly porous nanowires could be doped via all three routes, which resulted in highly doped nanowires with (projected areal) doping doses of 10(14)-10(15) boron atoms per cm(2) compared to 10(12) atoms per cm(2) for a non-porous planar sample. Highly porous nanowires were not compatible with the conventional monolayer doping technique, but monolayer contact doping and the combined route resulted for these highly porous nanowires in tremendously high doping doses up to 10(17) boron atoms per cm(2).

  19. Gene doping.

    PubMed

    Azzazy, Hassan M E

    2010-01-01

    Gene doping abuses the legitimate approach of gene therapy. While gene therapy aims to correct genetic disorders by introducing a foreign gene to replace an existing faulty one or by manipulating existing gene(s) to achieve a therapeutic benefit, gene doping employs the same concepts to bestow performance advantages on athletes over their competitors. Recent developments in genetic engineering have contributed significantly to the progress of gene therapy research and currently numerous clinical trials are underway. Some athletes and their staff are probably watching this progress closely. Any gene that plays a role in muscle development, oxygen delivery to tissues, neuromuscular coordination, or even pain control is considered a candidate for gene dopers. Unfortunately, detecting gene doping is technically very difficult because the transgenic proteins expressed by the introduced genes are similar to their endogenous counterparts. Researchers today are racing the clock because assuring the continued integrity of sports competition depends on their ability to develop effective detection strategies in preparation for the 2012 Olympics, which may mark the appearance of genetically modified athletes.

  20. Raman spectroscopy of InGaAs/GaAs nanoheterostructures δ-doped with Mn

    SciTech Connect

    Plankina, S. M.; Vikhrova, O. V.; Danilov, Yu. A.; Zvonkov, B. N.; Kalentyeva, I. L.; Nezhdanov, A. V.; Chunin, I. I.; Yunin, P. A.

    2015-01-15

    The results of complex studies of InGaAs/GaAs nanoheterostructures δ-doped with Mn are reported. The structures are grown by metal-organic vapor-phase epitaxy in combination with laser deposition. By confocal Raman spectroscopy, it is shown that the low-temperature δ-doped GaAs cap layers are of higher crystal quality compared to uniformly doped layers. Scattering of light in the coupled phonon-plasmon mode is observed. The appearance of this mode is conditioned by the diffusion of manganese from the δ-layer. The thickness of the cap layer is found to be d{sub c} ≈ 9–20 nm, optimal for attainment of the highest photoluminescence intensity of the quantum well and the highest layer concentration of holes by doping with manganese.

  1. 8-9 and 14-15 meu Two-Color 640x486 GaAs/AlGaAs Quantum Well Infrared Photodetector (QWIP) Focal Plane Array Camera

    NASA Technical Reports Server (NTRS)

    Guanapala, S.; Bandara, S.; Singh, A.; Liu, J.; Rafol, S.; Luong, E.; Mumolo, J.; Tran, N.; Vincent, J.; Shott, C.; Long, J.; LeVan, P.

    1999-01-01

    An optimized long-wavelength two-color Quantum Well Infrared Phototdetector (QWIP) device structure has been designed. This device structure was grown on a three-inch semi-insulating GaAs substrate by molecular beam epitaxy (MBE).

  2. Oxidation of the GaAs semiconductor at the Al2O3/GaAs junction.

    PubMed

    Tuominen, Marjukka; Yasir, Muhammad; Lång, Jouko; Dahl, Johnny; Kuzmin, Mikhail; Mäkelä, Jaakko; Punkkinen, Marko; Laukkanen, Pekka; Kokko, Kalevi; Schulte, Karina; Punkkinen, Risto; Korpijärvi, Ville-Markus; Polojärvi, Ville; Guina, Mircea

    2015-03-14

    Atomic-scale understanding and processing of the oxidation of III-V compound-semiconductor surfaces are essential for developing materials for various devices (e.g., transistors, solar cells, and light emitting diodes). The oxidation-induced defect-rich phases at the interfaces of oxide/III-V junctions significantly affect the electrical performance of devices. In this study, a method to control the GaAs oxidation and interfacial defect density at the prototypical Al2O3/GaAs junction grown via atomic layer deposition (ALD) is demonstrated. Namely, pre-oxidation of GaAs(100) with an In-induced c(8 × 2) surface reconstruction, leading to a crystalline c(4 × 2)-O interface oxide before ALD of Al2O3, decreases band-gap defect density at the Al2O3/GaAs interface. Concomitantly, X-ray photoelectron spectroscopy (XPS) from these Al2O3/GaAs interfaces shows that the high oxidation state of Ga (Ga2O3 type) decreases, and the corresponding In2O3 type phase forms when employing the c(4 × 2)-O interface layer. Detailed synchrotron-radiation XPS of the counterpart c(4 × 2)-O oxide of InAs(100) has been utilized to elucidate the atomic structure of the useful c(4 × 2)-O interface layer and its oxidation process. The spectral analysis reveals that three different oxygen sites, five oxidation-induced group-III atomic sites with core-level shifts between -0.2 eV and +1.0 eV, and hardly any oxygen-induced changes at the As sites form during the oxidation. These results, discussed within the current atomic model of the c(4 × 2)-O interface, provide insight into the atomic structures of oxide/III-V interfaces and a way to control the semiconductor oxidation.

  3. Droplet-mediated formation of embedded GaAs nanowires in MBE GaAs1-x Bi x films

    NASA Astrophysics Data System (ADS)

    Wood, Adam W.; Collar, Kristen; Li, Jincheng; Brown, April S.; Babcock, Susan E.

    2016-03-01

    We have examined the morphology and composition of embedded nanowires that can be formed during molecular beam epitaxy of GaAs1-x Bi x using high angle annular dark field (‘Z-contrast’) imaging in an aberration-corrected scanning transmission electron microscope. Samples were grown in Ga-rich growth conditions on a stationary GaAs substrate. Ga-rich droplets are observed on the surface with lateral trails extending from the droplet in the [110] direction. Cross-sectional scanning transmission electron microscopy of the film reveals epitaxial nanowire structures of composition ˜GaAs embedded in the GaAs1-x Bi x epitaxial layers. These nanowires extend from a surface droplet to the substrate at a shallow angle of inclination (˜4°). They typically are 4 μm long and have a lens-shaped cross section with major and minor axes dimensions of 800 and 120 nm. The top surface of the nanowires exhibits a linear trace in longitudinal cross-section, across which the composition change from ˜GaAs to GaAs1-x Bi x appears abrupt. The bottom surfaces of the nanowires appear wavy and the composition change appears to be graded over ˜25 nm. The droplets have phase separated into Ga- and Bi-rich components. A qualitative model is proposed in which Bi is gettered into Ga droplets, leaving Bi depleted nanowires in the wakes of the droplets as they migrate in one direction across the surface during GaAs1-x Bi x film growth.

  4. Ka-Band GaAs FET Monolithic Power Amplifier Development

    NASA Technical Reports Server (NTRS)

    Saunier, Paul; Tserng, Hua Quen

    1997-01-01

    Over the course of this program, very extensive progress was made in Ka-band GaAs technology. At the beginning of the program, odd-shaped VPE MESFET wafers were used. A breakthrough in power and efficiency was achieved with highly doped (8 x 10(exp 17) cm(exp -3) MBE grown MESFET material. We obtained power of 112 mW with 16 dB gain and 21.6% efficiency at 34 GHz with a monolithic 50-100-250 micron amplifier. The next breakthrough came with the use of heterostructures grown by MBE (AlGaAs/InGaAs where the InGaAs is highly doped). This allowed us to achieve high power density with high efficiency. A benchmark 40% efficiency was achieved with a single-stage 100 micron MMIC at 32.5 GHz. The corresponding three-stage 50-100-250 micron amplifier achieved 180 mW with 23 dB gain and 30.3% efficiency. The next breakthrough came with 3-inch MBE grown PHEMT wafers incorporating an etch-stop layer for the gate recess (using RIE). Again, state-of-the-art performances were achieved: 40% efficiency with 235 mW output power and 20.7 dB gain. The single-stage 2 x 600 micron chip demonstrated 794 mW output power with 5 dB gain and 38.2% power-added efficiency (PAE). The Ka-band technology developed under this program has promise for extensive use: JPL demonstrated 32 GHz phased arrays with a three-stage amplifier developed under this contract. A variation of the three-stage amplifier was used successfully in a 4 x 4 phased array transmitter developed under another NASA contract.

  5. Characterization of epiready n +-GaAs (100) surfaces by SPV-transient

    NASA Astrophysics Data System (ADS)

    Sinkkonen, Juha; Novikov, Sergey; Varpula, Aapo; Haapamaa, J.

    2007-12-01

    Surface photovoltage (SPV) transient provides a non-destructive, contact-free method for characterization of semiconductor surfaces. Here we study SPV-transients of differently cleaned, heavily doped epiready GaAs wafers. After a rapid initial part the transient shows a very slow decay taking place in 100 - 1000 s time scale. Chemical NH 4OH:H IIO II:H IIO cleaning and atomic hydrogen UHV cleaning are applied. SPV-transients are measured by Kelvin probe in normal atmospheric conditions. A large signal surface trapping model is developed which includes both majority and minority carrier processes and covers the whole light on, steady state, light off sequence. Model fitting allows band bending, energy and density of surface states as well as electron and hole capture cross-sections to be extracted. The results show that the traps are electronic states in thin oxide layer covering the samples. This conclusion is based on the finding that the capture cross-sections are very small, in the range 10 -19 - 10 -26 cm2, which calls tunneling for explanation. This indicates that after cleaning the oxide layer is rapidly re-grown in laboratory atmosphere in less than 30 min. Typical band bendings are 0.6 - 0.8 eV, trap energies are slightly above the mid-gap and the density of occupied trap states is around 5×10 12 cm -2 at thermal equilibrium.

  6. Fermi energy control of vacancy coalescence and dislocation density in melt-grown GaAs

    NASA Technical Reports Server (NTRS)

    Lagowski, J.; Gatos, H. C.; Lin, D. G.; Aoyama, T.

    1984-01-01

    A striking effect of the Fermi energy on the dislocation density in melt-grown GaAs has been discovered. Thus, a shift of the Fermi energy from 0.1 eV above to 0.2 eV below its intrinsic value (at high temperature, i.e., near 1100 K) increases the dislocation density by as much as five orders of magnitude. The Fermi energy shift was brought about by n-type and p-type doping at a level of about 10 to the 17th per cu cm (under conditions of optimum partial pressure of As, i.e., under optimum melt stoichiometry). This effect must be associated with the fact that the Fermi energy controls the charge state of vacancies (i.e., the occupancy of the associated electronic states) which in turn must control their tendency to coalesce and thus the dislocation density. It appears most likely that gallium vacancies are the critical species.

  7. Electrical activation of carbon δ-doped (Al,Ga)As grown by metalorganic vapour-phase epitaxy

    NASA Astrophysics Data System (ADS)

    Li, G.; Petravić, M.; Jagadish, C.

    1997-04-01

    Carbon δ-doped (Al,Ga)As was grown by metalorganic vapour-phase epitaxy using trimethylaluminium (TMAl) or trimethylgallium (TMGa) as a doping precursor. The best C δ-doped Al 0.3Ga 0.7As has a peak hole density of 1.6 × 10 19 (1.4 × 10 19 for GaAs) cm -3 with a full hole profile width at half maximum of 85 Å (84 Å for GaAs). For C δ-doped Al 0.3Ga 0.7 As grown at 630°C, the use of TMGa as a doping precursor leads to both the sheet C atom density and the free hole density increasing with an increase in the total TMGa moles introduced during a δ-doping step. As a result, the electrical activation remains almost constant with the change of TMGa moles supplied. The sheet C atom density always increases with increasing supply of TMAl, but approaches its maximum value at an amount of TMAl of 6.4 × 10 -7 mol. The electrical activation reduces from > 90% to < 10% when the supply of TMAl increases from 2.1 × 10 -7 to 8 × 10 -7 mol. Regardless of the doping precursors, the hole density weakly decreases and the C atom density significantly increases with increasing growth temperature. Low growth temperatures are required for high electrical activation. Using optimised growth conditions, C δ-doped pipi doping superlattices with different average hole densities are fabricated to obtain C bulk-doped-like layers.

  8. Fabrication of GaAs subwavelength structure (SWS) for solar cell applications.

    PubMed

    Kim, Byung-Jae; Kim, Jihyun

    2011-05-09

    We developed a novel GaAs subwavelength structure (SWS) as an antireflective layer for solar cell applications. The GaAs SWS patterns were fabricated by a combination of nanosphere lithography (NSL) and reactive ion etching (RIE). The shape and height of the GaAs SWS were controlled by the diameter of the SiO2 nanospheres and the etching time. Various GaAs SWS were characterized by the reflectance spectra. The average reflectance of the polished GaAs substrate from 200nm to 800nm was 35.1%. However, the average reflectance of the tapered GaAs SWS was reduced to 0.6% due to scattering and moth-eye effects.

  9. Studies of molecular-beam epitaxy growth of GaAs on porous Si substrates

    NASA Technical Reports Server (NTRS)

    Mii, Y. J.; Kao, Y. C.; Wu, B. J.; Wang, K. L.; Lin, T. L.; Liu, J. K.

    1988-01-01

    GaAs has been grown on porous Si directly and on Si buffer layer-porous Si substrates by molecular-beam epitaxy. In the case of GaAs growth on porous Si, transmission electron microscopy (TEM) reveals that the dominant defects in GaAs layers grown on porous Si are microtwins and stacking faults, which originate from the GaAs/porous Si interface. GaAs is found to penetrate into the porous Si layers. By using a thin Si buffer layer (50 nm), GaAs penetration diminishes and the density of microtwins and stacking faults is largely reduced and localized at the GaAs/Si buffer interface. However, there is a high density of threading dislocations remaining. Both Si (100) aligned and four degree tilted substrates have been examined in this study. TEM results show no observable effect of the tilted substrates on the quality of the GaAs epitaxial layer.

  10. Testing a GaAs cathode in SRF gun

    SciTech Connect

    Wang, E.; Kewisch, J.; Ben-Zvi, I.; Burrill, A.; Rao, T.; Wu, Q.; Holmes, D.

    2011-03-28

    RF electron guns with a strained superlattice GaAs cathode are expected to generate polarized electron beams of higher brightness and lower emittance than do DC guns, due to their higher field gradient at the cathode's surface and lower cathode temperature. We plan to install a bulk GaAs:Cs in a SRF gun to evaluate the performance of both the gun and the cathode in this environment. The status of this project is: In our 1.3 GHz 1/2 cell SRF gun, the vacuum can be maintained at nearly 10{sup -12} Torr because of cryo-pumping at 2K. With conventional activation of bulk GaAs, we obtained a QE of 10% at 532 nm, with lifetime of more than 3 days in the preparation chamber and have shown that it can survive in transport from the preparation chamber to the gun. The beam line has been assembled and we are exploring the best conditions for baking the cathode under vacuum. We report here the progress of our test of the GaAs cathode in the SRF gun. Future particle accelerators, such as eRHIC and the ILC require high-brightness, high-current polarized electrons. Strained superlattice GaAs:Cs has been shown to be an efficient cathode for producing polarized electrons. Activation of GaAs with Cs,O(F) lowers the electron affinity and makes it energetically possible for all the electrons, excited into the conduction band that drift or diffuse to the emission surface, to escape into the vacuum. Presently, all operating polarized electron sources, such as the CEBAF, are DC guns. In these devices, the excellent ultra-high vacuum extends the lifetime of the cathode. However, the low field gradient on the photocathode's emission surface of the DC guns limits the beam quality. The higher accelerating gradients, possible in the RF guns, generate a far better beam. Until recently, most RF guns operated at room temperature, limiting the vacuum to {approx}10{sup -9} Torr. This destroys the GaAs's NEA surface. The SRF guns combine the excellent vacuum conditions of DC guns and the high

  11. Cryogenic measurements of aerojet GaAs n-JFETs

    NASA Technical Reports Server (NTRS)

    Goebel, John H.; Weber, Theodore T.

    1993-01-01

    The spectral noise characteristics of Aerojet gallium arsenide (GaAs) junction field effect transistors (JFET's) have been investigated down to liquid-helium temperatures. Noise characterization was performed with the field effect transistor (FET) in the floating-gate mode, in the grounded-gate mode to determine the lowest noise readings possible, and with an extrinsic silicon photodetector at various detector bias voltages to determine optimum operating conditions. The measurements indicate that the Aerojet GaAs JFET is a quiet and stable device at liquid helium temperatures. Hence, it can be considered a readout line driver or infrared detector preamplifier as well as a host of other cryogenic applications. Its noise performance is superior to silicon (Si) metal oxide semiconductor field effect transistor (MOSFET's) operating at liquid helium temperatures, and is equal to the best Si n channel junction field effect transistor (n-JFET's) operating at 300 K.

  12. GaAs solar cells for laser power beaming

    NASA Technical Reports Server (NTRS)

    Olsen, Larry C.; Dunham, Glen; Huber, Daniel A.; Addis, F. William; Anheier, Norman; Coomes, E. P.

    1991-01-01

    Efforts to develop GaAs solar cells for coupling to laser beams in the wavelength range of 800 to 840 nm are described. This work was motivated primarily by interests in space-tp-space power beaming applications. In particular, the Battelle Pacific Northwest Laboratories is conducting studies of the utilization of power beaming for several future space missions. Modeling calculations of GaAs cell performance were carried out using PC-1D to determine an appropriate design for a p/n cell structure. Epitaxial wafers were grown by MOCVD and cells fabricated at WSU Tri-Cities. Under simulated conditions, an efficiency of 53 percent was achieved for a cell coupled to 806 nm light at 400 mW/sq cm.

  13. A V-grooved GaAs solar cell

    NASA Technical Reports Server (NTRS)

    Bailey, S. G.; Fatemi, N. S.; Landis, G. A.; Wilt, D. M.; Thomas, R. D.; Arrison, A.

    1988-01-01

    V-grooved GaAs solar cells promise the benefits of improved optical coupling, higher short-circuit current, and increased tolerance to particle radiation compared to planar cells. A GaAs homojunction cell was fabricated by etching a V-groove pattern into an n epilayer (2.1 x 10 to the 17th power per cu cm) grown by metalorganic chemical vapor deposition (MOCVD) on an n+ substrate (2.8 x 10 to the 18th power per cu cm) and then depositing and MOCVD p epilayer (4.2 x 10 to the 18th power per cu cm). Reflectivity measurements on cells with and without an antireflective coating confirm the expected decrease in reluctance of the microgrooved cell compared to the planar structure. The short circuit current of the V-grooved solar cell was 13 percent higher than that of the planar control.

  14. A V-grooved GaAs solar cell

    NASA Technical Reports Server (NTRS)

    Bailey, S. G.; Fatemi, N.; Landis, G. A.; Wilt, D. M.; Thomas, R. D.; Arrison, A.

    1988-01-01

    V-grooved GaAs solar cells promise the benefits of improved optical coupling, higher short-circuit current, and incrased tolerance to particle radiation compared to planar cells. A GaAs homojunction cell was fabricated by etching a V-groove pattern into an n-epilayer (2.1 x 10 to the 17th power per cu cm) grown by metalorganic chemical vapor deposition (MOCVD) on an n+ substrate (2.8 x 10 to the 18th power per cu cm) and then depositing an MOCVD p epilayer (4.2 x 10 to the 18th power per cu cm). Reflectivity measurements on cells with and without an antireflective coating confirm the expected decrease in reflectance of the microgrooved cell compared to the planar structure. The short-circuit current of the V-grooved solar cell was 13 percent higher than that of the planar control.

  15. Structure and diffusion in simulated liquid GaAs

    NASA Astrophysics Data System (ADS)

    Hanh, T. T. T.; Hoang, V. V.

    2010-03-01

    Structure and diffusion of Ga and As ions in simulated liquid GaAs have been studied in a model containing 3000 ions under periodic boundary conditions via molecular dynamics simulation (MD). The microstructure of systems has been analyzed through partial radial distribution functions (PRDFs), coordination number distributions, bond-angle distributions and interatomic distances. We found that calculated data agree well with the experimental ones. Temperature dependence of these distributions was obtained. Caculations show that liquid GaAs model with a real density at 5.3176 g cm-3 has a distorted tetrahedral network structure with the mean coordination number ZAs-Ga ≈ 4. Diffusion constant D in system has been calculated over temperatures ranged from 5000 K down to 1500 K. Calculations show that the temperature dependence of the diffusion constant D shows an Arrhenius law at relatively low temperatures above the melting point and it shows a power law, D˜ (T - Tc)γ, at higher temperatures.

  16. Optical detectors for GaAs MMIC integration: Technology assessment

    NASA Technical Reports Server (NTRS)

    Claspy, P. C.; Bhasin, K. B.

    1989-01-01

    Fiber optic links are being considered to transmit digital and analog signals in phased array antenna feed networks in space communications systems. The radiating elements in these arrays will be GaAs monolithic microwave integrated circuits (MMIC's) in numbers ranging from a few hundred to several thousand. If such optical interconnects are to be practical it appears essential that the associated components, including detectors, be monolithically integrated on the same chip as the microwave circuitry. The general issue of monolithic integration of microwave and optoelectronic components is addressed from the point of view of fabrication technology and compatibility. Particular attention is given to the fabrication technology of various types of GaAs optical detectors that are designed to operate at a wavelength of 830 nm.

  17. Crystal growth of device quality GaAs in space

    NASA Technical Reports Server (NTRS)

    Gatos, H. C.; Lagowski, J.

    1986-01-01

    It was established that the findings on elemental semiconductors Ge and Si regarding crystal growth, segregation, chemical composition, defect interactions, and materials properties-electronic properties relationships are not necessarily applicable to GaAs (and to other semiconductor compounds). In many instances totally unexpected relationships were found to prevail. It was further established that in compound semiconductors with a volatile constituent, control of stoichiometry is far more critical than any other crystal growth parameter. It was also shown that, due to suppression of nonstoichiometric fluctuations, the advantages of space for growth of semiconductor compounds extend far beyond those observed in elemental semiconductors. A novel configuration was discovered for partial confinement of GaAs melt in space which overcomes the two major problems associated with growth of semiconductors in total confinement. They are volume expansion during solidification and control of pressure of the volatile constituent. These problems are discussed in detail.

  18. Crystal growth of device quality GaAs in space

    NASA Technical Reports Server (NTRS)

    Gatos, Harry C.; Lagowski, Jacek

    1989-01-01

    The program on Crystal Growth of Device Quality GaAs in Space was initiated in 1977. The initial stage covering 1977 to 1984 was devoted strictly to ground-based research. By 1985 the program had evolved into its next logical stage aimed at space growth experiments; however, since the Challenger disaster, the program has been maintained as a ground-based program awaiting activation of experimentation in space. The overall prgram has produced some 80 original scientific publications on GaAs crystal growth, crystal characterization, and new approaches to space processing. Publication completed in the last three years are listed. Their key results are outlined and discussed in the twelve publications included as part of the report.

  19. Experimental examination of gaas dissolution in in-p melt

    NASA Astrophysics Data System (ADS)

    Bolkhovityanov, Yu. B.; Bolkhovityanova, R. I.; Chikichev, S. I.

    1983-05-01

    The “solubility” of GaAs crystals in quaternary In-Ga-As-P liquids (X{Ga/I} = X{As/I}) has been studied experi-mentally at 770°C using seed-dissolution technique. The location of the true liquidus isotherm has been established independently by means of the direct vi-sual observation technique. Comparison between the two data sets indicates that the first method can be successfully used only for those In-Ga-As-P melt compositions which have the corresponding solid InxGa1-xAsyP1-y alloys nearly lattice-matched to the GaAs substrate. In other cases the results obtained by this method are totally misleading although in-teresting as they are. The phenomenon of “catastro-phic” substrate erosion is investigated. The results of the present study are interpreted within the conceptual framework developed previously.

  20. Single Material Band Gap Engineering in GaAs Nanowires

    SciTech Connect

    Spirkoska, D.; Abstreiter, G.; Efros, A.; Conesa-Boj, S.; Morante, J. R.; Arbiol, J.; Fontcuberta i Morral, A.

    2011-12-23

    The structural and optical properties of GaAs nanowire with mixed zinc-blende/wurtzite structure are presented. High resolution transmission electron microscopy indicates the presence of a variety of shorter and longer segments of zinc-blende or wurtzite crystal phases. Sharp photoluminescence lines are observed with emission energies tuned from 1.515 eV down to 1.43 eV. The downward shift of the emission peaks can be understood by carrier confinement at the wurtzite/zinc-blende heterojunction, in quantum wells and in random short period superlattices existent in these nanowires, assuming the theoretical staggered band-offset between wurtzite and zinc-blende GaAs.

  1. Optical detectors for GaAs MMIC integration - Technology assessment

    NASA Technical Reports Server (NTRS)

    Claspy, P. C.; Bhasin, K. B.

    1989-01-01

    Fiber optic links are being considered to transmit digital and analog signals in phased array antenna feed networks in space communications systems. The radiating elements in these arrays will be GaAs monolithic microwave integrated circuits (MMIC's) in numbers ranging from a few hundred to several thousand. If such optical interconnects are to be practical it appears essential that the associated components, including detectors, be monolithically integrated on the same chip as the microwave circuitry. The general issue of monolithic integration of microwave and optoelectronic components is addressed from the point of view of fabrication technology and compatibility. Particular attention is given to the fabrication technology of various types of GaAs optical detectors that are designed to operate at a wavelength of 830 nm.

  2. High purity low dislocation GaAs single crystals

    NASA Technical Reports Server (NTRS)

    Chen, R. T.; Holmes, D. E.; Kirkpatrick, C. G.

    1982-01-01

    Recent advances in GaAs bulk crystal growth using the LEC (liquid encapsulated Czochralski) technique are described. The dependence of the background impurity concentration and the dislocation density distribution on the materials synthesis and growth conditions were investigated. Background impurity concentrations as low as 4 x 10 to the 15th power were observed in undoped LEC GaAs. The dislocation density in selected regions of individual ingots was very low, below the 3000 cm .3000/sq cm threshold. The average dislocation density over a large annular ring on the wafers fell below the 10000/sq cm level for 3 inch diameter ingots. The diameter control during the program advanced to a diameter variation along a 3 inch ingot less than 2 mm.

  3. The GaAs solar cell research and development programs of the Air Force

    NASA Technical Reports Server (NTRS)

    Masloski, K. T.

    1980-01-01

    The compound GaAs is of interest for space application photovoltaics due to its inherent advantages over silicon. Higher efficiencies, superior radiation hardness, and a greater temperature resistance are the major advantages of GaAs over Si. Air Force programs look for ways of maximizing these advantages while minimizing disadvantages such as higher costs and weights. Four programs in GaAs photovoltaics are described and each program is discussed in terms of its objective, approach and status.

  4. Performance Comparison of Top and Bottom Contact Gallium Arsenide (GaAs) Solar Cell

    DTIC Science & Technology

    2014-09-01

    Performance Comparison of Top and Bottom Contact Gallium Arsenide (GaAs) Solar Cell by Naresh C Das ARL-TR-7054 September 2014...September 2014 Performance Comparison of Top and Bottom Contact Gallium Arsenide (GaAs) Solar Cell Naresh C Das Sensors and Electron...From - To) 01/02/2014–07/15/2014 4. TITLE AND SUBTITLE Performance Comparison of Top and Bottom Contact Gallium Arsenide (GaAs) Solar Cell 5a

  5. Raman-scattering probe of anharmonic effects in GaAs

    NASA Astrophysics Data System (ADS)

    Verma, Prabhat; Abbi, S. C.; Jain, K. P.

    1995-06-01

    A comparative study of anharmonic effects in various structural forms of GaAs, namely crystalline, disordered and ion-implanted, and pulse laser annealed (PLA), using temperature-dependent Raman scattering, is reported for various phonon modes over the temperature range 10-300 K. The disordered and PLA samples are found to have greater anharmonicity than crystalline GaAs. The localized vibrational mode in PLA GaAs shows shorter relaxation time than the LO-phonon mode.

  6. Improved GaAs solar cells with very thin junctions

    NASA Technical Reports Server (NTRS)

    Hovel, H. J.; Woodall, J. M.

    1976-01-01

    Violet cells with 500-1000 A junction depths have been made in GaAs by narrow junction diffusion followed by anodization. The best AM0 efficiencies obtained by this technique have been 10.5% (14% at AM1). GaAlAs-GaAs structures with very thin GaAlAs layers are much more promising, and efficiencies of over 18% at AM0 have been measured (21.9% at AM1).

  7. On the dissolution properties of GaAs in Ga

    NASA Technical Reports Server (NTRS)

    Davidson, M. C.; Moynahan, A. H.

    1977-01-01

    The dissolution of GaAs in Ga was studied to determine the nature and cause of faceting effects. Ga was allowed to dissolve single crystalline faces under isothermal conditions. Of the crystalline planes with low number indices, only the (100) surface showed a direct correlation of dissolution sites to dislocations. The type of dissolution experienced depended on temperature, and there were three distinct types of behavior.

  8. Solar heating of GaAs nanowire solar cells.

    PubMed

    Wu, Shao-Hua; Povinelli, Michelle L

    2015-11-30

    We use a coupled thermal-optical approach to model the operating temperature rise in GaAs nanowire solar cells. We find that despite more highly concentrated light absorption and lower thermal conductivity, the overall temperature rise in a nanowire structure is no higher than in a planar structure. Moreover, coating the nanowires with a transparent polymer can increase the radiative cooling power by 2.2 times, lowering the operating temperature by nearly 7 K.

  9. Gallium arsenide (GaAs) solar cell modeling studies

    NASA Technical Reports Server (NTRS)

    Heinbockel, J. H.

    1980-01-01

    Various models were constructed which will allow for the variation of system components. Computer studies were then performed using the models constructed in order to study the effects of various system changes. In particular, GaAs and Si flat plate solar power arrays were studied and compared. Series and shunt resistance models were constructed. Models for the chemical kinetics of the annealing process were prepared. For all models constructed, various parametric studies were performed.

  10. Radiation damage in GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Conway, E. J.; Walker, G. H.

    1979-01-01

    Recent results of electron and proton irradiation and annealing of GaAs solar cells are presented along with some implications of these results. A comparison between the energy-levels produced by protons and by electrons which are not stopped in the material indicate that the damage produced by protons and electrons may be qualitatively different. Thus, annealing of proton damage may be very different from the annealing of electron damage.

  11. Monolithic GaAs surface acoustic wave chemical microsensor array

    SciTech Connect

    HIETALA,VINCENT M.; CASALNUOVO,STEPHEN A.; HELLER,EDWIN J.; WENDT,JOEL R.; FRYE-MASON,GREGORY CHARLES; BACA,ALBERT G.

    2000-03-09

    A four-channel surface acoustic wave (SAW) chemical sensor array with associated RF electronics is monolithically integrated onto one GaAs IC. The sensor operates at 690 MHz from an on-chip SAW based oscillator and provides simple DC voltage outputs by using integrated phase detectors. This sensor array represents a significant advance in microsensor technology offering miniaturization, increased chemical selectivity, simplified system assembly, improved sensitivity, and inherent temperature compensation.

  12. GaAs Concentrator Photovoltaic Power System Feasibility Investigation.

    DTIC Science & Technology

    1977-12-01

    cells at high intensity levels by permitting testing in a controlled thermal environment without the thermal problems ( heat flux) inherent with...multisun steady state simulation; i.e., the bulk cell temperature is constant and controlled by the backs de- heating /cooling block of the test fixture...determine the efficiency of the GaAs cells at various temperatures. Thus, the cells will be mounted on a small, thermocouple-equipped heat sink block

  13. Diboride diffusion barriers in silicon and GaAs technology

    NASA Astrophysics Data System (ADS)

    Shappirio, J. R.; Finnegan, J. J.; Lux, R. A.

    1986-12-01

    The synthesis and properties of a new class of contact compounds, the transition metal borides, are described. The effectiveness of the contact compounds as diffusion barriers when used to separate silicon from second level aluminum metallization is evaluated. Bulk and thin film resistivity and melting point data for disilicides and diborides are compared. The application of ZrB2 and TiB2 diffusion barriers to achieve stable ohmic contacts to n-type GaAs is discussed.

  14. A high-speed GaAs MESFET optical controller

    NASA Technical Reports Server (NTRS)

    Claspy, P. C.; Bhasin, K. B.; Richard, M.; Bendett, M.; Gustafson, G.

    1989-01-01

    Optical interconnects are being considered for control signal distribution in phased array antennas. A packaged hybrid GaAs optical controller with a 1:16 demultiplexed output that is suitable for this application is described. The controller, which was fabricated using enhancement/depletion mode MESFET technology, operates at demultiplexer-limited input data rates up to 305 Mb/s and requires less than 200 microW optical input power.

  15. GaAs Optoelectronic Integrated-Circuit Neurons

    NASA Technical Reports Server (NTRS)

    Lin, Steven H.; Kim, Jae H.; Psaltis, Demetri

    1992-01-01

    Monolithic GaAs optoelectronic integrated circuits developed for use as artificial neurons. Neural-network computer contains planar arrays of optoelectronic neurons, and variable synaptic connections between neurons effected by diffraction of light from volume hologram in photorefractive material. Basic principles of neural-network computers explained more fully in "Optoelectronic Integrated Circuits For Neural Networks" (NPO-17652). In present circuits, devices replaced by metal/semiconductor field effect transistors (MESFET's), which consume less power.

  16. Analysis of optical absorption in GaAs nanowire arrays.

    PubMed

    Guo, Haomin; Wen, Long; Li, Xinhua; Zhao, Zhifei; Wang, Yuqi

    2011-12-06

    In this study, the influence of the geometric parameters on the optical absorption of gallium arsenide [GaAs] nanowire arrays [NWAs] has been systematically analyzed using finite-difference time-domain simulations. The calculations reveal that the optical absorption is sensitive to the geometric parameters such as diameter [D], length [L], and filling ratio [D/P], and more efficient light absorption can be obtained in GaAs NWAs than in thin films with the same thickness due to the combined effects of intrinsic antireflection and efficient excitation of resonant modes. Optimized geometric parameters are obtained as follows: D = 180 nm, L = 2 μm, and D/P = 0.5. Meanwhile, the simulation on the absorption of GaAs NWAs for oblique incidence has also been carried out. The underlying physics is discussed in this work.PACS: 81.07.Gf nanowires; 81.05.Ea III-V semiconductors; 88.40.hj efficiency and performance of solar cells; 73.50.Pz photoconduction and photovoltaic effects.

  17. Burst annealing of high temperature GaAs solar cells

    NASA Technical Reports Server (NTRS)

    Brothers, P. R.; Horne, W. E.

    1991-01-01

    One of the major limitations of solar cells in space power systems is their vulnerability to radiation damage. One solution to this problem is to periodically heat the cells to anneal the radiation damage. Annealing was demonstrated with silicon cells. The obstacle to annealing of GaAs cells was their susceptibility to thermal damage at the temperatures required to completely anneal the radiation damage. GaAs cells with high temperature contacts and encapsulation were developed. The cells tested are designed for concentrator use at 30 suns AMO. The circular active area is 2.5 mm in diameter for an area of 0.05 sq cm. Typical one sun AMO efficiency of these cells is over 18 percent. The cells were demonstrated to be resistant to damage after thermal excursions in excess of 600 C. This high temperature tolerance should allow these cells to survive the annealing of radiation damage. A limited set of experiments were devised to investigate the feasibility of annealing these high temperature cells. The effect of repeated cycles of electron and proton irradiation was tested. The damage mechanisms were analyzed. Limitations in annealing recovery suggested improvements in cell design for more complete recovery. These preliminary experiments also indicate the need for further study to isolate damage mechanisms. The primary objective of the experiments was to demonstrate and quantify the annealing behavior of high temperature GaAs cells. Secondary objectives were to measure the radiation degradation and to determine the effect of repeated irradiation and anneal cycles.

  18. Ab initio study of hot electrons in GaAs.

    PubMed

    Bernardi, Marco; Vigil-Fowler, Derek; Ong, Chin Shen; Neaton, Jeffrey B; Louie, Steven G

    2015-04-28

    Hot carrier dynamics critically impacts the performance of electronic, optoelectronic, photovoltaic, and plasmonic devices. Hot carriers lose energy over nanometer lengths and picosecond timescales and thus are challenging to study experimentally, whereas calculations of hot carrier dynamics are cumbersome and dominated by empirical approaches. In this work, we present ab initio calculations of hot electrons in gallium arsenide (GaAs) using density functional theory and many-body perturbation theory. Our computed electron-phonon relaxation times at the onset of the Γ, L, and X valleys are in excellent agreement with ultrafast optical experiments and show that the ultrafast (tens of femtoseconds) hot electron decay times observed experimentally arise from electron-phonon scattering. This result is an important advance to resolve a controversy on hot electron cooling in GaAs. We further find that, contrary to common notions, all optical and acoustic modes contribute substantially to electron-phonon scattering, with a dominant contribution from transverse acoustic modes. This work provides definitive microscopic insight into hot electrons in GaAs and enables accurate ab initio computation of hot carriers in advanced materials.

  19. Ab initio study of hot electrons in GaAs

    PubMed Central

    Bernardi, Marco; Vigil-Fowler, Derek; Ong, Chin Shen; Neaton, Jeffrey B.; Louie, Steven G.

    2015-01-01

    Hot carrier dynamics critically impacts the performance of electronic, optoelectronic, photovoltaic, and plasmonic devices. Hot carriers lose energy over nanometer lengths and picosecond timescales and thus are challenging to study experimentally, whereas calculations of hot carrier dynamics are cumbersome and dominated by empirical approaches. In this work, we present ab initio calculations of hot electrons in gallium arsenide (GaAs) using density functional theory and many-body perturbation theory. Our computed electron–phonon relaxation times at the onset of the Γ, L, and X valleys are in excellent agreement with ultrafast optical experiments and show that the ultrafast (tens of femtoseconds) hot electron decay times observed experimentally arise from electron–phonon scattering. This result is an important advance to resolve a controversy on hot electron cooling in GaAs. We further find that, contrary to common notions, all optical and acoustic modes contribute substantially to electron–phonon scattering, with a dominant contribution from transverse acoustic modes. This work provides definitive microscopic insight into hot electrons in GaAs and enables accurate ab initio computation of hot carriers in advanced materials. PMID:25870287

  20. Transient GaAs plasmonic metasurfaces at terahertz frequencies

    DOE PAGES

    Yang, Yuanmu; Kamaraju, N.; Campione, Salvatore; ...

    2016-12-09

    Here we demonstrate the ultrafast formation of terahertz (THz) metasurfaces through all-optical creation of spatially modulated carrier density profiles in a deep-subwavelength GaAs film. The switch-on of the transient plasmon mode, governed by the GaAs effective electron mass and electron–phonon interactions, is revealed by structured-optical pump THz probe spectroscopy, on a time scale of 500 fs. By modulating the carrier density using different pump fluences, we observe a wide tuning of the electric dipole resonance of the transient GaAs metasurface from 0.5 THz to 1.7 THz. Furthermore, we numerically demonstrate that the metasurface presented here can be generalized to moremore » complex architectures for realizing functionalities such as perfect absorption, leading to a 30 dB modulation depth. In conclusion, the platform also provides a pathway to achieve ultrafast manipulation of infrared beams in the linear and, potentially, nonlinear regime.« less