Development of a slicer integral field unit for the existing optical spectrograph FOCAS: progress

NASA Astrophysics Data System (ADS)

Ozaki, Shinobu; Tanaka, Yoko; Hattori, Takashi; Mitsui, Kenji; Fukushima, Mitsuhiro; Okada, Norio; Obuchi, Yoshiyuki; Tsuzuki, Toshihiro; Miyazaki, Satoshi; Yamashita, Takuya

2014-07-01

We are developing an integral field unit (IFU) with an image slicer for the existing optical spectrograph, Faint Object Camera And Spectrograph (FOCAS), on the Subaru Telescope. The slice width is 0.43 arcsec, the slice number is 23, and the field of view is 13.5 × 9.89 arcsec2. Sky spectrum separated by about 5.7 arcmin from an object field can be simultaneously obtained, which allows us precise background subtraction. Slice mirrors, pupil mirrors and slit mirrors are all glass, and their mirror surfaces are fabricated by polishing. Our IFU is about 200 mm × 300 mm × 80 mm in size and 1 kg in weight. It is installed into a mask storage in FOCAS along with one or two mask plates, and inserted into the optical path by using the existing mask exchange mechanism. This concept allow us flexible operation such as Targets of Opportunity observations. High reflectivity of multilayer dielectric coatings offers high throughput (>80%) of the IFU. In this paper, we will report a final optical layout, its performances, and results of prototyping works.

Technique for ship/wake detection

DOEpatents

Roskovensky, John K [Albuquerque, NM

2012-05-01

An automated ship detection technique includes accessing data associated with an image of a portion of Earth. The data includes reflectance values. A first portion of pixels within the image are masked with a cloud and land mask based on spectral flatness of the reflectance values associated with the pixels. A given pixel selected from the first portion of pixels is unmasked when a threshold number of localized pixels surrounding the given pixel are not masked by the cloud and land mask. A spatial variability image is generated based on spatial derivatives of the reflectance values of the pixels which remain unmasked by the cloud and land mask. The spatial variability image is thresholded to identify one or more regions within the image as possible ship detection regions.

How Does Target Duration Affect Object Substitution Masking?

ERIC Educational Resources Information Center

Gellatly, Angus; Pilling, Michael; Carter, Wakefield; Guest, Duncan

2010-01-01

Object substitution masking (OSM) is typically studied using a brief search display. The target item may be indicated by a cue/mask surrounding but not overlapping it. Report of the target is reduced when mask offset trails target offset rather than being simultaneous with it. We report 5 experiments investigating whether OSM can be obtained if…

Preschoolers' Person Description and Identification Accuracy: A Comparison of the Simultaneous and Elimination Lineup Procedures

ERIC Educational Resources Information Center

Pozzulo, Joanna D.; Dempsey, Julie; Crescini, Charmagne

2009-01-01

Preschoolers' (3- to 6-year-olds) person description and identification abilities were examined using the simultaneous and elimination lineup procedures. Participants (N = 100) were exposed to a 20-minute mask-making session conducted by a female confederate who acted as the mask-making teacher. After a brief delay (20 min), participants were…

A diffusion model account of masked vs. unmasked priming: Are they qualitatively different?

PubMed Central

Gomez, Pablo; Perea, Manuel; Ratcliff, Roger

2017-01-01

In the past decades, hundreds of articles have explored the mechanisms underlying priming. Most researchers assume that masked and unmasked priming are qualitatively different. For masked priming, the effects are often assumed to reflect savings in the encoding of the target stimulus, whereas for unmasked priming, it has been suggested that the effects reflect the familiarity of the prime-target compound cue. In contrast, other researchers have claimed that masked and unmasked priming reflect essentially the same core processes. In this article, we use the diffusion model (Ratcliff, 1978) to account for the effects of masked and unmasked priming for identity and associatively related primes. The fits of the model lead us to the following conclusion: masked related primes give a head start to the processing of the target compared to unrelated primes, while unmasked priming affects primarily the quality of the lexical information. PMID:23647337

Weighted least-square approach for simultaneous measurement of multiple reflective surfaces

NASA Astrophysics Data System (ADS)

Tang, Shouhong; Bills, Richard E.; Freischlad, Klaus

2007-09-01

Phase shifting interferometry (PSI) is a highly accurate method for measuring the nanometer-scale relative surface height of a semi-reflective test surface. PSI is effectively used in conjunction with Fizeau interferometers for optical testing, hard disk inspection, and semiconductor wafer flatness. However, commonly-used PSI algorithms are unable to produce an accurate phase measurement if more than one reflective surface is present in the Fizeau interferometer test cavity. Examples of test parts that fall into this category include lithography mask blanks and their protective pellicles, and plane parallel optical beam splitters. The plane parallel surfaces of these parts generate multiple interferograms that are superimposed in the recording plane of the Fizeau interferometer. When using wavelength shifting in PSI the phase shifting speed of each interferogram is proportional to the optical path difference (OPD) between the two reflective surfaces. The proposed method is able to differentiate each underlying interferogram from each other in an optimal manner. In this paper, we present a method for simultaneously measuring the multiple test surfaces of all underlying interferograms from these superimposed interferograms through the use of a weighted least-square fitting technique. The theoretical analysis of weighted least-square technique and the measurement results will be described in this paper.

Characterizing the reflectivity of handheld display devices.

PubMed

Liu, Peter; Badano, Aldo

2014-08-01

With increased use of handheld and tablet display devices for viewing medical images, methods for consistently measuring reflectivity of the devices are needed. In this note, the authors report on the characterization of diffuse reflections for handheld display devices including mobile phones and tablets using methods recommended by the American Association of Physicists in Medicine Task Group 18 (TG18). The authors modified the diffuse reflectance coefficient measurement method outlined in the TG18 report. The authors measured seven handheld display devices (two phones and five tablets) and three workstation displays. The device was attached to a black panel with Velcro. To study the effect of the back surface on the diffuse reflectance coefficient, the authors created Styrofoam masks with different size square openings and placed it in front of the device. Overall, for each display device, measurements of illuminance and reflected luminance on the display screen were taken. The authors measured with no mask, with masks of varying size, and with display-size masks, and calculated the corresponding diffuse reflectance coefficient. For all handhelds, the diffuse reflectance coefficient measured with no back panel were lower than measurements performed with a mask. The authors found an overall increase in reflectivity as the size of the mask decreases. For workstations displays, diffuse reflectance coefficients were higher when no back panel was used, and higher than with masks. In all cases, as luminance increased, illuminance increased, but not at the same rate. Since the size of handheld displays is smaller than that of workstation devices, the TG18 method suffers from a dependency on illumination condition. The authors show that the diffuse reflection coefficients can vary depending on the nature of the back surface of the illuminating box. The variability in the diffuse coefficient can be as large as 20% depending on the size of the mask. For all measurements, both luminance and illuminance increased as the size of the display window decreased. The TG18 method does not account for this variability. The authors conclude that the method requires a definitive description of the back panel used in the light source setup. The methods described in the TG18 document may need to be improved to provide consistent comparisons of desktop monitors, phones, and tablets.

Dual-sided coded-aperture imager

DOEpatents

Ziock, Klaus-Peter [Clinton, TN

2009-09-22

In a vehicle, a single detector plane simultaneously measures radiation coming through two coded-aperture masks, one on either side of the detector. To determine which side of the vehicle a source is, the two shadow masks are inverses of each other, i.e., one is a mask and the other is the anti-mask. All of the data that is collected is processed through two versions of an image reconstruction algorithm. One treats the data as if it were obtained through the mask, the other as though the data is obtained through the anti-mask.

Simultaneous masking additivity for short Gaussian-shaped tones: spectral effects.

PubMed

Laback, Bernhard; Necciari, Thibaud; Balazs, Peter; Savel, Sophie; Ystad, Sølvi

2013-08-01

Laback et al. [(2011). J. Acoust. Soc. Am. 129, 888-897] investigated the additivity of nonsimultaneous masking using short Gaussian-shaped tones as maskers and target. The present study involved Gaussian stimuli to measure the additivity of simultaneous masking for combinations of up to four spectrally separated maskers. According to most basilar membrane measurements, the maskers should be processed linearly at the characteristic frequency (CF) of the target. Assuming also compression of the target, all masker combinations should produce excess masking (exceeding linear additivity). The results for a pair of maskers flanking the target indeed showed excess masking. The amount of excess masking could be predicted by a model assuming summation of masker-evoked excitations in intensity units at the target CF and compression of the target, using compressive input/output functions derived from the nonsimultaneous masking study. However, the combinations of lower-frequency maskers showed much less excess masking than predicted by the model. This cannot easily be attributed to factors like off-frequency listening, combination tone perception, or between-masker suppression. It was better predicted, however, by assuming weighted intensity summation of masker excitations. The optimum weights for the lower-frequency maskers were smaller than one, consistent with partial masker compression as indicated by recent psychoacoustic data.

Method and apparatus for inspecting reflection masks for defects

DOEpatents

Bokor, Jeffrey; Lin, Yun

2003-04-29

An at-wavelength system for extreme ultraviolet lithography mask blank defect detection is provided. When a focused beam of wavelength 13 nm is incident on a defective region of a mask blank, three possible phenomena can occur. The defect will induce an intensity reduction in the specularly reflected beam, scatter incoming photons into an off-specular direction, and change the amplitude and phase of the electric field at the surface which can be monitored through the change in the photoemission current. The magnitude of these changes will depend on the incident beam size, and the nature, extent and size of the defect. Inspection of the mask blank is performed by scanning the mask blank with 13 nm light focused to a spot a few .mu.m in diameter, while measuring the reflected beam intensity (bright field detection), the scattered beam intensity (dark-field detection) and/or the change in the photoemission current.

EUVL mask patterning with blanks from commercial suppliers

NASA Astrophysics Data System (ADS)

Yan, Pei-Yang; Zhang, Guojing; Nagpal, Rajesh; Shu, Emily Y.; Li, Chaoyang; Qu, Ping; Chen, Frederick T.

2004-12-01

Extreme Ultraviolet Lithography (EUVL) reflective mask blank development includes low thermal expansion material fabrication, mask substrate finishing, reflective multi-layer (ML) and capping layer deposition, buffer (optional)/absorber stack deposition, EUV specific metrology, and ML defect inspection. In the past, we have obtained blanks deposited with various layer stacks from several vendors. Some of them are not commercial suppliers. As a result, the blank and patterned mask qualities are difficult to maintain and improve. In this paper we will present the evaluation results of the EUVL mask pattering processes with the complete EUVL mask blanks supplied by the commercial blank supplier. The EUVL mask blanks used in this study consist of either quartz or ULE substrates which is a type of low thermal expansion material (LTEM), 40 pairs of molybdenum/silicon (Mo/Si) ML layer, thin ruthenium (Ru) capping layer, tantalum boron nitride (TaBN) absorber, and chrome (Cr) backside coating. No buffer layer is used. Our study includes the EUVL mask blank characterization, patterned EUVL mask characterization, and the final patterned EUVL mask flatness evaluation.

Masking agent-free and channel-switch-mode simultaneous sensing of Fe(3+) and Hg(2+) using dual-excitation graphene quantum dots.

PubMed

Xu, Fengzhou; Shi, Hui; He, Xiaoxiao; Wang, Kemin; He, Dinggeng; Yan, Lv'an; Ye, Xiaosheng; Tang, Jinlu; Shangguan, Jingfang; Luo, Lan

2015-06-21

A novel channel-switch-mode strategy for simultaneous sensing of Fe(3+) and Hg(2+) is developed with dual-excitation single-emission graphene quantum dots (GQDs). By utilizing the dual-channel fluorescence response performance of GQDs, this strategy achieved a facile, low-cost, masking agent-free, quantitative and selective dual-ion assay even in mixed ion samples and practical water samples.

Development of a slicer integral field unit for the existing optical imaging spectrograph FOCAS

NASA Astrophysics Data System (ADS)

Ozaki, Shinobu; Tanaka, Yoko; Hattori, Takashi; Mitsui, Kenji; Fukusima, Mitsuhiro; Okada, Norio; Obuchi, Yoshiyuki; Miyazaki, Satoshi; Yamashita, Takuya

2012-09-01

We are developing an integral field unit (IFU) with an image slicer for the existing optical imaging spectrograph, Faint Object Camera And Spectrograph (FOCAS), on the Subaru Telescope. Basic optical design has already finished. The slice width is 0.4 arcsec, slice number is 24, and field of view is 13.5x 9.6 arcsec. Sky spectra separated by about 3 arcmin from an object field can be simultaneously obtained, which allows us precise background subtraction. The IFU will be installed as a mask plate and set by the mask exchanger mechanism of FOCAS. Slice mirrors, pupil mirrors and slit mirrors are all made of glass, and their mirror surfaces are fabricated by polishing. Multilayer dielectric reflective coating with high reflectivity (< 98%) is made on each mirror surface. Slicer IFU consists of many mirrors which need to be arraigned with high accuracy. For such alignment, we will make alignment jigs and mirror holders made with high accuracy. Some pupil mirrors need off-axis ellipsoidal surfaces to reduce aberration. We are conducting some prototyping works including slice mirrors, an off-axis ellipsoidal surface, alignment jigs and a mirror support. In this paper, we will introduce our project and show those prototyping works.

Large-area soft x-ray projection lithography using multilayer mirrors structured by RIE

NASA Astrophysics Data System (ADS)

Rahn, Steffen; Kloidt, Andreas; Kleineberg, Ulf; Schmiedeskamp, Bernt; Kadel, Klaus; Schomburg, Werner K.; Hormes, F. J.; Heinzmann, Ulrich

1993-01-01

SXPL (soft X-ray projection lithography) is one of the most promising applications of X-ray reflecting optics using multilayer mirrors. Within our collaboration, such multilayer mirrors were fabricated, characterized, laterally structured and then used as reflection masks in a projecting lithography procedure. Mo/Si-multilayer mirrors were produced by electron beam evaporation in UHV under thermal treatment with an in-situ X-ray controlled thickness in the region of 2d equals 14 nm. The reflectivities measured at normal incidence reached up to 54%. Various surface analysis techniques have been applied in order to characterize and optimize the X-ray mirrors. The multilayers were patterned by reactive ion etching (RIE) with CF(subscript 4), using a photoresist as the etch mask, thus producing X-ray reflection masks. The masks were tested in the synchrotron radiation laboratory of the electron accelerator ELSA at the Physikalisches Institut of Bonn University. A double crystal X-ray monochromator was modified so as to allow about 0.5 cm(superscript 2) of the reflection mask to be illuminated by white synchrotron radiation. The reflected patterns were projected (with an energy of 100 eV) onto the resist (Hoechst AZ PF 514), which was mounted at an average distance of about 7 mm. In the first test-experiments, structure sizes down to 8 micrometers were nicely reproduced over the whole of the exposed area. Smaller structures were distorted by Fresnel-diffraction. The theoretically calculated diffraction images agree very well with the observed images.

Defect tolerant transmission lithography mask

DOEpatents

Vernon, Stephen P.

2000-01-01

A transmission lithography mask that utilizes a transparent substrate or a partially transparent membrane as the active region of the mask. A reflective single layer or multilayer coating is deposited on the membrane surface facing the illumination system. The coating is selectively patterned (removed) to form transmissive (bright) regions. Structural imperfections and defects in the coating have negligible effect on the aerial image of the mask master pattern since the coating is used to reflect radiation out of the entrance pupil of the imaging system. Similarly, structural imperfections in the clear regions of the membrane have little influence on the amplitude or phase of the transmitted electromagnetic fields. Since the mask "discards," rather than absorbs, unwanted radiation, it has reduced optical absorption and reduced thermal loading as compared to conventional designs. For EUV applications, the mask circumvents the phase defect problem, and is independent of the thermal load during exposure.

Face mask use by patients in primary care.

PubMed

Tischendorf, Jessica S; Temte, Jonathan L

2012-02-01

Face masks are recommended for patients with respiratory symptoms to reduce influenza transmission. Little knowledge exists regarding actual utilization and acceptance of face masks in primary care. Compare distribution of face masks to clinic and community trends in respiratory infection (RI) and influenza-like illness (ILI); estimate the annual need for face masks in primary care. Retrospective observational study of practice data from a 31-week period starting in October 2009. Family practice clinic in Madison, Wis. Patients with fever, cough, or other respiratory symptoms as evaluated by reception staff. Age, sex, and weekly counts of individuals receiving a face mask, as well as counts of RI and ILI patients based on ICD-9 coding from 27 statewide clinics. Face mask counts were 80% of RI counts for the clinic and reflected the demographics of the clinic population. Distribution was correlated to prevalence of RI (R = 0.783, P < 0.001) and ILI (R = 0.632, P < 0.001). Annually, 8% of clinic visits were for RI. The high percentage of face mask use among RI patients reflects the feasibility of this intervention to help control influenza transmission in a primary care setting. Using the present data, clinics can estimate the annual need for face masks.

Temperature independent refractive index measurement using a fiber Bragg grating on abrupt tapered tip

NASA Astrophysics Data System (ADS)

Gomes, André D.; Silveira, Beatriz; Warren-Smith, Stephen C.; Becker, Martin; Rothhardt, Manfred; Frazão, Orlando

2018-05-01

A fiber Bragg grating was inscribed in an abrupt fiber taper using a femtosecond laser and phase-mask interferometer. The abrupt taper transition allows to excite a broad range of guided modes with different effective refractive indices that are reflected at different wavelengths according to Bragg's law. The multimode-Bragg reflection expands over 30 nm in the telecom-C-band. This corresponds to a mode-field overlap of up to 30% outside of the fiber, making the device suitable for evanescent field sensing. Refractive index and temperature measurements are performed for different reflection peaks. Temperature independent refractive index measurements are achieved by considering the difference between the wavelength shifts of two measured reflection peaks. A minimum refractive index sensitivity of 16 ± 1 nm/RIU was obtained in a low refractive index regime (1.3475-1.3720) with low influence of temperature (-0.32 ± 0.06 pm/°C). The cross sensitivity for this structure is 2.0 × 10-5 RIU/°C. The potential for simultaneous measurement of refractive index and temperature is also studied.

Metacontrast masking is processed before grapheme-color synesthesia.

PubMed

Bacon, Michael Patrick; Bridgeman, Bruce; Ramachandran, Vilayanur S

2013-01-01

We investigated the physiological mechanism of grapheme-color synesthesia using metacontrast masking. A metacontrast target is rendered invisible by a mask that is delayed by about 60 ms; the target and mask do not overlap in space or time. Little masking occurs, however, if the target and mask are simultaneous. This effect must be cortical, because it can be obtained dichoptically. To compare the data for synesthetes and controls, we developed a metacontrast design in which nonsynesthete controls showed weaker dichromatic masking (i.e., the target and mask were in different colors) than monochromatic masking. We accomplished this with an equiluminant target, mask, and background for each observer. If synesthetic color affected metacontrast, synesthetes should show monochromatic masking more similar to the weak dichromatic masking among controls, because synesthetes could add their synesthetic color to the monochromatic condition. The target-mask pairs used for each synesthete were graphemes that elicited strong synesthetic colors. We found stronger monochromatic than dichromatic U-shaped metacontrast for both synesthetes and controls, with optimal masking at an asynchrony of 66 ms. The difference in performance between the monochromatic and dichromatic conditions in the synesthetes indicates that synesthesia occurs at a later processing stage than does metacontrast masking.

Contribution of Binaural Masking Release to Improved Speech Intelligibility for different Masker types.

PubMed

Sutojo, Sarinah; van de Par, Steven; Schoenmaker, Esther

2018-06-01

In situations with competing talkers or in the presence of masking noise, speech intelligibility can be improved by spatially separating the target speaker from the interferers. This advantage is generally referred to as spatial release from masking (SRM) and different mechanisms have been suggested to explain it. One proposed mechanism to benefit from spatial cues is the binaural masking release, which is purely stimulus driven. According to this mechanism, the spatial benefit results from differences in the binaural cues of target and masker, which need to appear simultaneously in time and frequency to improve the signal detection. In an alternative proposed mechanism, the differences in the interaural cues improve the segregation of auditory streams, a process, which involves top-down processing rather than being purely stimulus driven. Other than the cues that produce binaural masking release, the interaural cue differences between target and interferer required to improve stream segregation do not have to appear simultaneously in time and frequency. This study is concerned with the contribution of binaural masking release to SRM for three masker types that differ with respect to the amount of energetic masking they exert. Speech intelligibility was measured, employing a stimulus manipulation that inhibits binaural masking release, and analyzed with a metric to account for the number of better-ear glimpses. Results indicate that the contribution of the stimulus-driven binaural masking release plays a minor role while binaural stream segregation and the availability of glimpses in the better ear had a stronger influence on improving the speech intelligibility. This article is protected by copyright. All rights reserved. This article is protected by copyright. All rights reserved.

Remote sensing of submerged aquatic vegetation in lower Chesapeake Bay - A comparison of Landsat MSS to TM imagery

NASA Technical Reports Server (NTRS)

Ackleson, S. G.; Klemas, V.

1987-01-01

Landsat MSS and TM imagery, obtained simultaneously over Guinea Marsh, VA, as analyzed and compares for its ability to detect submerged aquatic vegetation (SAV). An unsupervised clustering algorithm was applied to each image, where the input classification parameters are defined as functions of apparent sensor noise. Class confidence and accuracy were computed for all water areas by comparing the classified images, pixel-by-pixel, to rasterized SAV distributions derived from color aerial photography. To illustrate the effect of water depth on classification error, areas of depth greater than 1.9 m were masked, and class confidence and accuracy recalculated. A single-scattering radiative-transfer model is used to illustrate how percent canopy cover and water depth affect the volume reflectance from a water column containing SAV. For a submerged canopy that is morphologically and optically similar to Zostera marina inhabiting Lower Chesapeake Bay, dense canopies may be isolated by masking optically deep water. For less dense canopies, the effect of increasing water depth is to increase the apparent percent crown cover, which may result in classification error.

Implicit Semantic Perception in Object Substitution Masking

ERIC Educational Resources Information Center

Goodhew, Stephanie C.; Visser, Troy A. W.; Lipp, Ottmar V.; Dux, Paul E.

2011-01-01

Decades of research on visual perception has uncovered many phenomena, such as binocular rivalry, backward masking, and the attentional blink, that reflect "failures of consciousness". Although stimuli do not reach awareness in these paradigms, there is evidence that they nevertheless undergo semantic processing. Object substitution masking (OSM),…

The Emergence of Visual Awareness: Temporal Dynamics in Relation to Task and Mask Type

PubMed Central

Kiefer, Markus; Kammer, Thomas

2017-01-01

One aspect of consciousness phenomena, the temporal emergence of visual awareness, has been subject of a controversial debate. How can visual awareness, that is the experiential quality of visual stimuli, be characterized best? Is there a sharp discontinuous or dichotomous transition between unaware and fully aware states, or does awareness emerge gradually encompassing intermediate states? Previous studies yielded conflicting results and supported both dichotomous and gradual views. It is well conceivable that these conflicting results are more than noise, but reflect the dynamic nature of the temporal emergence of visual awareness. Using a psychophysical approach, the present research tested whether the emergence of visual awareness is context-dependent with a temporal two-alternative forced choice task. During backward masking of word targets, it was assessed whether the relative temporal sequence of stimulus thresholds is modulated by the task (stimulus presence, letter case, lexical decision, and semantic category) and by mask type. Four masks with different similarity to the target features were created. Psychophysical functions were then fitted to the accuracy data in the different task conditions as a function of the stimulus mask SOA in order to determine the inflection point (conscious threshold of each feature) and slope of the psychophysical function (transition from unaware to aware within each feature). Depending on feature-mask similarity, thresholds in the different tasks were highly dispersed suggesting a graded transition from unawareness to awareness or had less differentiated thresholds indicating that clusters of features probed by the tasks quite simultaneously contribute to the percept. The latter observation, although not compatible with the notion of a sharp all-or-none transition between unaware and aware states, suggests a less gradual or more discontinuous emergence of awareness. Analyses of slopes of the fitted psychophysical functions also indicated that the emergence of awareness of single features is variable and might be influenced by the continuity of the feature dimensions. The present work thus suggests that the emergence of awareness is neither purely gradual nor dichotomous, but highly dynamic depending on the task and mask type. PMID:28316583

Mask technology for EUV lithography

NASA Astrophysics Data System (ADS)

Bujak, M.; Burkhart, Scott C.; Cerjan, Charles J.; Kearney, Patrick A.; Moore, Craig E.; Prisbrey, Shon T.; Sweeney, Donald W.; Tong, William M.; Vernon, Stephen P.; Walton, Christopher C.; Warrick, Abbie L.; Weber, Frank J.; Wedowski, Marco; Wilhelmsen, Karl C.; Bokor, Jeffrey; Jeong, Sungho; Cardinale, Gregory F.; Ray-Chaudhuri, Avijit K.; Stivers, Alan R.; Tejnil, Edita; Yan, Pei-yang; Hector, Scott D.; Nguyen, Khanh B.

1999-04-01

Extreme UV Lithography (EUVL) is one of the leading candidates for the next generation lithography, which will decrease critical feature size to below 100 nm within 5 years. EUVL uses 10-14 nm light as envisioned by the EUV Limited Liability Company, a consortium formed by Intel and supported by Motorola and AMD to perform R and D work at three national laboratories. Much work has already taken place, with the first prototypical cameras operational at 13.4 nm using low energy laser plasma EUV light sources to investigate issues including the source, camera, electro- mechanical and system issues, photoresists, and of course the masks. EUV lithograph masks are fundamentally different than conventional photolithographic masks as they are reflective instead of transmissive. EUV light at 13.4 nm is rapidly absorbed by most materials, thus all light transmission within the EUVL system from source to silicon wafer, including EUV reflected from the mask, is performed by multilayer mirrors in vacuum.

Masked Repetition Priming Using Magnetoencephalography

ERIC Educational Resources Information Center

Monahan, Philip J.; Fiorentino, Robert; Poeppel, David

2008-01-01

Masked priming is used in psycholinguistic studies to assess questions about lexical access and representation. We present two masked priming experiments using MEG. If the MEG signal elicited by words reflects specific aspects of lexical retrieval, then one expects to identify specific neural correlates of retrieval that are sensitive to priming.…

Method for validating cloud mask obtained from satellite measurements using ground-based sky camera.

PubMed

Letu, Husi; Nagao, Takashi M; Nakajima, Takashi Y; Matsumae, Yoshiaki

2014-11-01

Error propagation in Earth's atmospheric, oceanic, and land surface parameters of the satellite products caused by misclassification of the cloud mask is a critical issue for improving the accuracy of satellite products. Thus, characterizing the accuracy of the cloud mask is important for investigating the influence of the cloud mask on satellite products. In this study, we proposed a method for validating multiwavelength satellite data derived cloud masks using ground-based sky camera (GSC) data. First, a cloud cover algorithm for GSC data has been developed using sky index and bright index. Then, Moderate Resolution Imaging Spectroradiometer (MODIS) satellite data derived cloud masks by two cloud-screening algorithms (i.e., MOD35 and CLAUDIA) were validated using the GSC cloud mask. The results indicate that MOD35 is likely to classify ambiguous pixels as "cloudy," whereas CLAUDIA is likely to classify them as "clear." Furthermore, the influence of error propagations caused by misclassification of the MOD35 and CLAUDIA cloud masks on MODIS derived reflectance, brightness temperature, and normalized difference vegetation index (NDVI) in clear and cloudy pixels was investigated using sky camera data. It shows that the influence of the error propagation by the MOD35 cloud mask on the MODIS derived monthly mean reflectance, brightness temperature, and NDVI for clear pixels is significantly smaller than for the CLAUDIA cloud mask; the influence of the error propagation by the CLAUDIA cloud mask on MODIS derived monthly mean cloud products for cloudy pixels is significantly smaller than that by the MOD35 cloud mask.

Calibration of a Spatial-Temporal Discrimination Model from Forward, Simultaneous, and Backward Masking

NASA Technical Reports Server (NTRS)

Ahumada, Albert J.; Beard, B. L.; Stone, Leland (Technical Monitor)

1997-01-01

We have been developing a simplified spatial-temporal discrimination model similar to our simplified spatial model in that masking is assumed to be a function of the local visible contrast energy. The overall spatial-temporal sensitivity of the model is calibrated to predict the detectability of targets on a uniform background. To calibrate the spatial-temporal integration functions that define local visible contrast energy, spatial-temporal masking data are required. Observer thresholds were measured (2IFC) for the detection of a 12 msec target stimulus in the presence of a 700 msec mask. Targets were 1, 3 or 9 c/deg sine wave gratings. Masks were either one of these gratings or two of them combined. The target was presented in 17 temporal positions with respect to the mask, including positions before, during and after the mask. Peak masking was found near mask onset and offset for 1 and 3 c/deg targets, while masking effects were more nearly uniform during the mask for the 9 c/deg target. As in the purely spatial case, the simplified model can not predict all the details of masking as a function of masking component spatial frequencies, but overall the prediction errors are small.

Alphabetic letter identification: Effects of perceivability, similarity, and bias☆

PubMed Central

Mueller, Shane T.; Weidemann, Christoph T.

2012-01-01

The legibility of the letters in the Latin alphabet has been measured numerous times since the beginning of experimental psychology. To identify the theoretical mechanisms attributed to letter identification, we report a comprehensive review of literature, spanning more than a century. This review revealed that identification accuracy has frequently been attributed to a subset of three common sources: perceivability, bias, and similarity. However, simultaneous estimates of these values have rarely (if ever) been performed. We present the results of two new experiments which allow for the simultaneous estimation of these factors, and examine how the shape of a visual mask impacts each of them, as inferred through a new statistical model. Results showed that the shape and identity of the mask impacted the inferred perceivability, bias, and similarity space of a letter set, but that there were aspects of similarity that were robust to the choice of mask. The results illustrate how the psychological concepts of perceivability, bias, and similarity can be estimated simultaneously, and how each make powerful contributions to visual letter identification. PMID:22036587

Mask-to-wafer alignment system

DOEpatents

Sweatt, William C.; Tichenor, Daniel A.; Haney, Steven J.

2003-11-04

A modified beam splitter that has a hole pattern that is symmetric in one axis and anti-symmetric in the other can be employed in a mask-to-wafer alignment device. The device is particularly suited for rough alignment using visible light. The modified beam splitter transmits and reflects light from a source of electromagnetic radiation and it includes a substrate that has a first surface facing the source of electromagnetic radiation and second surface that is reflective of said electromagnetic radiation. The substrate defines a hole pattern about a central line of the substrate. In operation, an input beam from a camera is directed toward the modified beam splitter and the light from the camera that passes through the holes illuminates the reticle on the wafer. The light beam from the camera also projects an image of a corresponding reticle pattern that is formed on the mask surface of the that is positioned downstream from the camera. Alignment can be accomplished by detecting the radiation that is reflected from the second surface of the modified beam splitter since the reflected radiation contains both the image of the pattern from the mask and a corresponding pattern on the wafer.

EUVL Mask Blank Repair

DOE Office of Scientific and Technical Information (OSTI.GOV)

Barty, A; Mirkarimi, P; Stearns, D G

2002-05-22

EUV mask blanks are fabricated by depositing a reflective Mo/Si multilayer film onto super-polished substrates. Small defects in this thin film coating can significantly alter the reflected field and introduce defects in the printed image. Ideally one would want to produce defect-free mask blanks; however, this may be very difficult to achieve in practice. One practical way to increase the yield of mask blanks is to effectively repair multilayer defects, and to this effect they present two complementary defect repair strategies for use on multilayer-coated EUVL mask blanks. A defect is any area on the mask which causes unwanted variationsmore » in EUV dose in the aerial image obtained in a printing tool, and defect repair is correspondingly defined as any strategy that renders a defect unprintable during exposure. The term defect mitigation can be adopted to describe any strategy which renders a critical defect non-critical when printed, and in this regard a non-critical defect is one that does not adversely affect device function. Defects in the patterned absorber layer consist of regions where metal, typically chrome, is unintentionally added or removed from the pattern leading to errors in the reflected field. There currently exists a mature technology based on ion beam milling and ion beam assisted deposition for repairing defects in the absorber layer of transmission lithography masks, and it is reasonable to expect that this technology will be extended to the repair of absorber defects in EUVL masks. However, techniques designed for the repair of absorber layers can not be directly applied to the repair of defects in the mask blank, and in particular the multilayer film. In this paper they present for the first time a new technique for the repair of amplitude defects as well as recent results on the repair of phase defects.« less

An assessment of thin cloud detection by applying bidirectional reflectance distribution function model-based background surface reflectance using Geostationary Ocean Color Imager (GOCI): A case study for South Korea

NASA Astrophysics Data System (ADS)

Kim, Hye-Won; Yeom, Jong-Min; Shin, Daegeun; Choi, Sungwon; Han, Kyung-Soo; Roujean, Jean-Louis

2017-08-01

In this study, a new assessment of thin cloud detection with the application of bidirectional reflectance distribution function (BRDF) model-based background surface reflectance was undertaken by interpreting surface spectra characterized using the Geostationary Ocean Color Imager (GOCI) over a land surface area. Unlike cloud detection over the ocean, the detection of cloud over land surfaces is difficult due to the complicated surface scattering characteristics, which vary among land surface types. Furthermore, in the case of thin clouds, in which the surface and cloud radiation are mixed, it is difficult to detect the clouds in both land and atmospheric fields. Therefore, to interpret background surface reflectance, especially underneath cloud, the semiempirical BRDF model was used to simulate surface reflectance by reflecting solar angle-dependent geostationary sensor geometry. For quantitative validation, Cloud-Aerosol Lidar and Infrared Pathfinder Satellite Observation (CALIPSO) data were used to make a comparison with the proposed cloud masking result. As a result, the new cloud masking scheme resulted in a high probability of detection (POD = 0.82) compared with the Moderate Resolution Imaging Spectroradiometer (MODIS) (POD = 0.808) for all cloud cases. In particular, the agreement between the CALIPSO cloud product and new GOCI cloud mask was over 94% when detecting thin cloud (e.g., altostratus and cirrus) from January 2014 to June 2015. This result is relatively high in comparison with the result from the MODIS Collection 6 cloud mask product (MYD35).

The Mask Designs for Space Interferometer Mission (SIM)

NASA Technical Reports Server (NTRS)

Wang, Xu

2008-01-01

The Space Interferometer Mission (SIM) consists of three interferometers (science, guide1, and guide2) and two optical paths (metrology and starlight). The system requirements for each interferometer/optical path combination are different and sometimes work against each other. A diffraction model is developed to design and optimize various masks to simultaneously meet the system requirements of three interferometers. In this paper, the details of this diffraction model will be described first. Later, the mask design for each interferometer will be presented to demonstrate the system performance compliance. In the end, a tolerance sensitivity study on the geometrical dimension, shape, and the alignment of these masks will be discussed.

An eight-octant phase-mask coronagraph for the Subaru coronagraphic extreme AO (SCExAO) system: system design and expected performance

NASA Astrophysics Data System (ADS)

Murakami, Naoshi; Guyon, Olivier; Martinache, Frantz; Matsuo, Taro; Yokochi, Kaito; Nishikawa, Jun; Tamura, Motohide; Kurokawa, Takashi; Baba, Naoshi; Vogt, Frédéric; Garrel, Vincent; Yoshikawa, Takashi

2010-07-01

An eight-octant phase-mask (EOPM) coronagraph is one of the highest performance coronagraphic concepts, and attains simultaneously high throughput, small inner working angle, and large discovery space. However, its application to ground-based telescopes such as the Subaru Telescope is challenging due to pupil geometry (thick spider vanes and large central obstruction) and residual tip-tilt errors. We show that the Subaru Coronagraphic Extreme Adaptive Optics (SCExAO) system, scheduled to be installed onto the Subaru Telescope, includes key technologies which can solve these problems. SCExAO uses a spider removal plate which translates four parts of the pupil with tilted plane parallel plates. The pupil central obstruction can be removed by a pupil remapping system similar to the PIAA optics already in the SCExAO system, which could be redesigned with no amplitude apodization. The EOPM is inserted in the focal plane to divide a stellar image into eight-octant regions, and introduces a π-phase difference between adjacent octants. This causes a self-destructive interference inside the pupil area on a following reimaged pupil plane. By using a reflective mask instead of a conventional opaque Lyot stop, the stellar light diffracted outside the pupil can be used for a coronagraphic low-order wave-front sensor to accurately measure and correct tip-tilt errors. A modified inverse-PIAA system, located behind the reimaged pupil plane, is used to remove off-axis aberrations and deliver a wide field of view. We show that this EOPM coronagraph architecture enables high contrast imaging at small working angle on the Subaru Telescope. Our approach could be generalized to other phase-mask type coronagraphs and other ground-based telescopes.

Active Masks and Active Inhibition: A Comment on Lleras and Enns (2004) and on Verleger, Jaskowski, Aydemir, van der Lubbe, and Groen (2004)

ERIC Educational Resources Information Center

Schlaghecken, Friederike; Eimer, Martin

2006-01-01

Verleger, Jaskowski, Aydemir, van der Lubbe, and Groen (see record 2004-21166-002) and Lleras and Enns (see record 2004-21166-001) have argued that negative compatibility effects (NCEs) obtained with masked primes do not reflect self-inhibition processes in motor control. Instead, NCEs are assumed to reflect activation of the response opposite to…

Influence of auditory fatigue on masked speech intelligibility

NASA Technical Reports Server (NTRS)

Parker, D. E.; Martens, W. L.; Johnston, P. A.

1980-01-01

Intelligibility of PB word lists embedded in simultaneous masking noise was evaluated before and after fatiguing-noise exposure, which was determined by observing the number of words correctly repeated during a shadowing task. Both the speech signal and the masking noise were filtered to a 2825-3185-Hz band. Masking-noise leves were varied from 0- to 90-dB SL. Fatigue was produced by a 1500-3000-Hz octave band of noise at 115 dB (re 20 micron-Pa) presented continuously for 5 min. The results of three experiments indicated that speed intelligibility was reduced when the speech was presented against a background of silence but that the fatiguing-noise exposure had no effect on intelligibility when the speech was made more intense and embedded in masking noise of 40-90-dB SL. These observations are interpreted by considering the recruitment produced by fatigue and masking noise.

EUVL masks: paving the path for commercialization

NASA Astrophysics Data System (ADS)

Mangat, Pawitter J. S.; Hector, Scott D.

2001-09-01

Optical projection lithography has been the principal vehicle of semiconductor manufacturing for more than 20 years and is marching aggressively to satisfy the needs of semiconductor manufacturers for 100nm devices. However, the complexity of optical lithography continues to increase as wavelength reduction continues to 157nm. Extreme Ultraviolet Lithography (EUVL), with wavelength from 13-14 nm, is evolving as a leading next generation lithography option for semiconductor industry to stay on the path laid by Moore's Law. Masks are a critical part of the success of any technology and are considered to be high risk both for optical lithography and NGL technologies for sub-100nm lithography. Two key areas of EUV mask fabrication are reflective multilayer deposition and absorber patterning. In the case of reflective multilayers, delivering defect free multilayers for mask blanks is the biggest challenge. Defect mitigation is being explored as a possible option to smooth the multilayer defects in addition to optimization of the deposition process to reduce defect density. The mask patterning process needs focus on the defect-free absorber stack patterning process, mask cleaning, inspection and repair. In addition, there is considerable effort to understand by simulations, the defect printability, thermal and mechanical distortions, and non-telecentric illumination, to mention a few. To protect the finished mask from defects added during use, a removable pellicle strategy combined with thermophoretic protection during exposure is being developed. Recent migration to square form factor using low thermal expansion material (LTEM) is advantageous as historical developments in optical masks can be applied to EUV mask patterning. This paper addresses recent developments in the EUV mask patterning and highlights critical manufacturing process controls needed to fabricate defect-free full field masks with CD and image placement specifications for sub-70nm node lithography. No technology can be implemented without establishing the commercial infrastructure. The rising cost seems to be a major issue affecting the technology development. With respect to mask fabrication for commercial availability, a virtual mask shop analysis is presented that indicates that the process cost for EUVL masks are comparable to the high end optical mask with a reasonable yield. However, the cost for setting up a new mask facility is considerably high.

Method and apparatus for inspecting an EUV mask blank

DOEpatents

Goldberg, Kenneth A.

2005-11-08

An apparatus and method for at-wavelength EUV mask-blank characterization for inspection of moderate and low spatial frequency coating uniformity using a synchrotron or other source of EUV light. The apparatus provides for rapid, non-destruction, non-contact, at-wavelength qualification of large mask areas, and can be self-calibrating or be calibrated to well-characterized reference samples. It can further check for spatial variation of mask reflectivity or for global differences among masks. The apparatus and method is particularly suited for inspection of coating uniformity and quality and can detect defects in the order of 50 .mu.m and above.

Color constancy for an unseen surface.

PubMed

Norman, Liam J; Akins, Kathleen; Heywood, Charles A; Kentridge, Robert W

2014-12-01

The illumination of a scene strongly affects our perception of objects in that scene, e.g., the pages of a book illuminated by candlelight will appear quite yellow relative to other types of artificial illuminants. Yet at the same time, the reader still judges the pages as white, their surface color unaffected by the interplay of paper and illuminant. It has been shown empirically that we can indeed report two quite different interpretations of "color": one is dependent on the constant surface spectral reflectance of an object (surface color) and the other on the power of light of different wavelengths reflected from that object (reflected color). How then are these two representations related? The common view, dating from Aristotle, is that our experience of surface color is derived from reflected color or, in more familiar terms, that color perception follows from color sensation. By definition, color constancy requires that vision "discounts the illuminant"; thus, it seems reasonable that vision begins with the color of objects as they naively appear and that we infer from their appearances their surface color. Here, we question this classic view. We use metacontrast-masked priming and, by presenting the unseen prime and the visible mask under different illuminants, dissociate two ways in which the prime matched the mask: in surface color or in reflected color. We find that priming of the mask occurs when it matches the prime in surface color, not reflected color. It follows that color perception can arise without prior color sensation. Copyright © 2014 Elsevier Ltd. All rights reserved.

Relationship of extinction to perceptual thresholds for single stimuli.

PubMed

Meador, K J; Ray, P G; Day, L J; Loring, D W

2001-04-24

To demonstrate the effects of target stimulus intensity on extinction to double simultaneous stimuli. Attentional deficits contribute to extinction in patients with brain lesions, but extinction (i.e., masking) can also be produced in healthy subjects. The relationship of extinction to perceptual thresholds for single stimuli remains uncertain. Brief electrical pulses were applied simultaneously to the left and right index fingers of 16 healthy volunteers (8 young and 8 elderly adults) and 4 patients with right brain stroke (RBS). The stimulus to be perceived (i.e., target stimulus) was given at the lowest perceptual threshold to perceive any single stimulus (i.e., Minimal) and at the threshold to perceive 100% of single stimuli. The mask stimulus (i.e., stimulus given to block the target) was applied to the contralateral hand at intensities just below discomfort. Extinction was less for target stimuli at 100% than Minimal threshold for healthy subjects. Extinction of left targets was greater in patients with RBS than elderly control subjects. Left targets were extinguished less than right in healthy subjects. In contrast, the majority of left targets were extinguished in patients with RBS even when right mask intensity was reduced below right 100% threshold for single stimuli. RBS patients had less extinction for right targets despite having greater left mask - threshold difference than control subjects. In patients with RBS, right "targets" at 100% threshold extinguished left "masks" (20%) almost as frequently as left masks extinguished right targets (32%). Subtle changes in target intensity affect extinction in healthy adults. Asymmetries in mask and target intensities (relative to single-stimulus perceptual thresholds) affect extinction in RBS patients less for left targets but more for right targets as compared with control subjects.

High Contrast Internal and External Coronagraph Masks Produced by Various Techniques

NASA Technical Reports Server (NTRS)

Balasubramanian, Kunjithapatha; Wilson, Daniel; White, Victor; Muller, Richard; Dickie, Matthew; Yee, Karl; Ruiz, Ronald; Shaklan, Stuart; Cady, Eric; Kern, Brian;

The songs of Tlaloc: Interference of ten ceramical duct flutes, Offering 89 of the Aztec Templo Mayor

NASA Astrophysics Data System (ADS)

Both, M. A. Adje

2002-11-01

Among the many preserved sound artefacts deposited in the offerings of the Aztec Templo Mayor are a set of ten tubular duct flutes made from clay, dating Late Postclassic Mesoamerica, 1350-1521 AD. The aerophones are completely painted in blue, and characterized by: (1) a short mouthpiece; (2) a framed aperture; (3) a tube with four fingerholes; and (4) an applicated mask with features of the Aztec rain god Tlaloc, basically three rings and a standardized relief structure of two clouds. While all measurements follow the same pattern, one particular organological distinction was made, as five flutes show an exit hole in the middle ring of the mask and five flutes are stopped. Thus, five instruments sound considerably higher, apart from the minimal pitch deviation of each specimen. Both the tonal capacity of each flute and the acoustics of several flutes played simultaneously were recorded and measured. A series of remarkable interference effects could be produced, which were strongly related to the ritual complex reflected in the offering. Taking in consideration the Aztec concept of music, it could be supposed that they were perceived as a principle of the song, or proper voice of Tlaloc.

Method for the manufacture of phase shifting masks for EUV lithography

DOEpatents

Stearns, Daniel G.; Sweeney, Donald W.; Mirkarimi, Paul B.; Barty, Anton

2006-04-04

A method for fabricating an EUV phase shift mask is provided that includes a substrate upon which is deposited a thin film multilayer coating that has a complex-valued reflectance. An absorber layer or a buffer layer is attached onto the thin film multilayer, and the thickness of the thin film multilayer coating is altered to introduce a direct modulation in the complex-valued reflectance to produce phase shifting features.

Condenser for photolithography system

DOEpatents

Sweatt, William C.

2004-03-02

A condenser for a photolithography system, in which a mask image from a mask is projected onto a wafer through a camera having an entrance pupil, includes a source of propagating radiation, a first mirror illuminated by the radiation, a mirror array illuminated by the radiation reflected from said first mirror, and a second mirror illuminated by the radiation reflected from the array. The mirror array includes a plurality of micromirrors. Each of the micromirrors is selectively actuatable independently of each other. The first mirror and the second mirror are disposed such that the source is imaged onto a plane of the mask and the mirror array is imaged into the entrance pupil of the camera.

Low thermal distortion extreme-UV lithography reticle

DOEpatents

Gianoulakis, Steven E.; Ray-Chaudhuri, Avijit K.

2002-01-01

Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.

Low thermal distortion extreme-UV lithography reticle

DOEpatents

Gianoulakis, Steven E.; Ray-Chaudhuri, Avijit K.

2001-01-01

Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.

Self-masking: Listening during vocalization. Normal hearing.

PubMed

Borg, Erik; Bergkvist, Christina; Gustafsson, Dan

2009-06-01

What underlying mechanisms are involved in the ability to talk and listen simultaneously and what role does self-masking play under conditions of hearing impairment? The purpose of the present series of studies is to describe a technique for assessment of masked thresholds during vocalization, to describe normative data for males and females, and to focus on hearing impairment. The masking effect of vocalized [a:] on narrow-band noise pulses (250-8000 Hz) was studied using the maximum vocalization method. An amplitude-modulated series of sound pulses, which sounded like a steam engine, was masked until the criterion of halving the perceived pulse rate was reached. For masking of continuous reading, a just-follow-conversation criterion was applied. Intra-session test-retest reproducibility and inter-session variability were calculated. The results showed that female voices were more efficient in masking high frequency noise bursts than male voices and more efficient in masking both a male and a female test reading. The male had to vocalize 4 dBA louder than the female to produce the same masking effect on the test reading. It is concluded that the method is relatively simple to apply and has small intra-session and fair inter-session variability. Interesting gender differences were observed.

Auditory processing efficiency deficits in children with developmental language impairments

NASA Astrophysics Data System (ADS)

Hartley, Douglas E. H.; Moore, David R.

2002-12-01

The ``temporal processing hypothesis'' suggests that individuals with specific language impairments (SLIs) and dyslexia have severe deficits in processing rapidly presented or brief sensory information, both within the auditory and visual domains. This hypothesis has been supported through evidence that language-impaired individuals have excess auditory backward masking. This paper presents an analysis of masking results from several studies in terms of a model of temporal resolution. Results from this modeling suggest that the masking results can be better explained by an ``auditory efficiency'' hypothesis. If impaired or immature listeners have a normal temporal window, but require a higher signal-to-noise level (poor processing efficiency), this hypothesis predicts the observed small deficits in the simultaneous masking task, and the much larger deficits in backward and forward masking tasks amongst those listeners. The difference in performance on these masking tasks is predictable from the compressive nonlinearity of the basilar membrane. The model also correctly predicts that backward masking (i) is more prone to training effects, (ii) has greater inter- and intrasubject variability, and (iii) increases less with masker level than do other masking tasks. These findings provide a new perspective on the mechanisms underlying communication disorders and auditory masking.

Uniformity Masks Design Method Based on the Shadow Matrix for Coating Materials with Different Condensation Characteristics

PubMed Central

2013-01-01

An intuitionistic method is proposed to design shadow masks to achieve thickness profile control for evaporation coating processes. The proposed method is based on the concept of the shadow matrix, which is a matrix that contains coefficients that build quantitive relations between shape parameters of masks and shadow quantities of substrate directly. By using the shadow matrix, shape parameters of shadow masks could be derived simply by solving a matrix equation. Verification experiments were performed on a special case where coating materials have different condensation characteristics. By using the designed mask pair with complementary shapes, thickness uniformities of better than 98% are demonstrated for MgF2 (m = 1) and LaF3 (m = 0.5) simultaneously on a 280 mm diameter spherical substrate with the radius curvature of 200 mm. PMID:24227996

Novel EUV mask black border suppressing EUV and DUV OoB light reflection

NASA Astrophysics Data System (ADS)

Ito, Shin; Kodera, Yutaka; Fukugami, Norihito; Komizo, Toru; Maruyama, Shingo; Watanabe, Genta; Yoshida, Itaru; Kotani, Jun; Konishi, Toshio; Haraguchi, Takashi

2016-05-01

EUV lithography is the most promising technology for semiconductor device manufacturing of the 10nm node and beyond. The image border is a pattern free dark area around the die on the photomask serving as transition area between the parts of the mask that is shielded from the exposure light by the Reticle Masking (REMA) blades and the die. When printing a die at dense spacing on an EUV scanner, the reflection from the image border overlaps edges of neighboring dies, affecting CD and contrast in this area. This is related to the fact that EUV absorber stack reflects 1-3% of actinic EUV light. To reduce this effect several types of image border with reduced EUV reflectance (<0.05%) have been proposed; such an image border is referred to as a black border. In particular, an etched multilayer type black border was developed; it was demonstrated that CD impact at the edge of a die is strongly reduced with this type of the black border (BB). However, wafer printing result still showed some CD change in the die influenced by the black border reflection. It was proven that the CD shift was caused by DUV Out of Band (OOB) light from the EUV light source. New types of a multilayer etched BB were evaluated and showed a good potential for DUV light suppression. In this study, a novel BB called `Hybrid Black Border' (HBB) has been developed to eliminate EUV and DUV OOB light reflection by applying optical design technique and special micro-fabrication technique. A new test mask with HBB is fabricated without any degradation of mask quality according to the result of CD performance in the main pattern, defectivity and cleaning durability. The imaging performance for N10 imaging structures is demonstrated on NXE:3300B in collaboration with ASML. This result is compared to the imaging results obtained for a mask with the earlier developed BB, and HBB has achieved ~3x improvement; less than 0.2 nm CD changes are observed in the corners of the die. A CD uniformity budget including impact of OOB light in the die edge area is evaluated which shows that the OOB impact from HBB becomes comparable with other CDU contributors in this area. Finally, we state that HBB is a promising technology allowing for CD control at die edges.

Modeling of thermomechanical changes of extreme-ultraviolet mask and their dependence on absorber variation

NASA Astrophysics Data System (ADS)

Ban, Chung-Hyun; Park, Eun-Sang; Park, Jae-Hun; Oh, Hye-Keun

2018-06-01

Thermal and structural deformation of extreme-ultraviolet lithography (EUVL) masks during the exposure process may become important issues as these masks are subject to rigorous image placement and flatness requirements. The reflective masks used for EUVL absorb energy during exposure, and the temperature of the masks rises as a result. This can cause thermomechanical deformation that can reduce the pattern quality. The use of very thick low-thermal-expansion substrate materials (LTEMs) may reduce energy absorption, but they do not completely eliminate mask deformation. Therefore, it is necessary to predict and optimize the effects of energy transferred from the extreme-ultraviolet (EUV) light source and the resultant patterns of structured EUV masks with complex multilayers. Our study shows that heat accumulates in the masks as exposure progresses. It has been found that a higher absorber ratio (pattern density) applied to the patterning of EUV masks exacerbates the problem, especially in masks with more complex patterns.

Modeling and Observations of Phase-Mask Trapezoidal Profiles with Grating-Fiber Image Reproduction

NASA Technical Reports Server (NTRS)

Lyons, Donald R.; Lindesay, James V.; Lee, Hyung R.; Ndlela, Zolili U.; Thompso, Erica J.

2000-01-01

We report on an investigation of the trapezoidal design and fabrication defects in phase masks used to produce Bragg reflection gratings in optical fibers. We used a direct visualization technique to examine the nonuniformity of the interference patterns generated by several phase masks. Fringe patterns from the phase masks are compared with the analogous patterns resulting from two-beam interference. Atomic force microscope imaging of the actual phase gratings that give rise to anomalous fringe patterns is used to determine input parameters for a general theoretical model. Phase masks with pitches of 0.566 and 1.059 microns are modeled and investigated.

Intelligibility of Target Signals in Sequential and Simultaneous Segregation Tasks

DTIC Science & Technology

2009-03-01

SUBJECT TERMS Informational masking; energetic masking, multimasker penalty, speech perception 16. SECURITY CLASSIFICATION OF: 17. LIMITATION OF...alter- nation rates were high enough to directly interfere with the perception of the F0 values of the speech signals and that they thus disrupted the...segregation effects seen in this experiment and those in which stream segregation with tones was examined. Experiments examining the perception of

A precedence effect resolves phantom sound source illusions in the parasitoid fly Ormia ochracea

PubMed Central

Lee, Norman; Elias, Damian O.; Mason, Andrew C.

2009-01-01

Localizing individual sound sources under reverberant environmental conditions can be a challenge when the original source and its acoustic reflections arrive at the ears simultaneously from different paths that convey ambiguous directional information. The acoustic parasitoid fly Ormia ochracea (Diptera: Tachinidae) relies on a pair of ears exquisitely sensitive to sound direction to localize the 5-kHz tone pulsatile calling song of their host crickets. In nature, flies are expected to encounter a complex sound field with multiple sources and their reflections from acoustic clutter potentially masking temporal information relevant to source recognition and localization. In field experiments, O. ochracea were lured onto a test arena and subjected to small random acoustic asymmetries between 2 simultaneous sources. Most flies successfully localize a single source but some localize a ‘phantom’ source that is a summed effect of both source locations. Such misdirected phonotaxis can be elicited reliably in laboratory experiments that present symmetric acoustic stimulation. By varying onset delay between 2 sources, we test whether hyperacute directional hearing in O. ochracea can function to exploit small time differences to determine source location. Selective localization depends on both the relative timing and location of competing sources. Flies preferred phonotaxis to a forward source. With small onset disparities within a 10-ms temporal window of attention, flies selectively localize the leading source while the lagging source has minimal influence on orientation. These results demonstrate the precedence effect as a mechanism to overcome phantom source illusions that arise from acoustic reflections or competing sources. PMID:19332794

LightLeaves: computer controlled kinetic reflection hologram installation and a brief discussion of earlier work

NASA Astrophysics Data System (ADS)

Connors Chen, Betsy

2013-02-01

LightLeaves is an installation combining leaf shaped, white light reflection holograms of landscape images with a special kinetic lighting device that houses a lamp and moving leaf shaped masks. The masks are controlled by an Arduino microcontroller and servomotors that position the masks in front of the illumination source of the holograms. The work is the most recent in a long series of landscapes that combine multi-hologram installations with computer controlled devices that play with the motion of the holograms, the light, sound or other elements in the work. LightLeaves was first exhibited at the Peabody Essex Museum in Salem, Massachusetts in a show titled "Eye Spy: Playing with Perception".

On the effectiveness of noise masks: naturalistic vs. un-naturalistic image statistics.

PubMed

Hansen, Bruce C; Hess, Robert F

2012-05-01

It has been argued that the human visual system is optimized for identification of broadband objects embedded in stimuli possessing orientation averaged power spectra fall-offs that obey the 1/f(β) relationship typically observed in natural scene imagery (i.e., β=2.0 on logarithmic axes). Here, we were interested in whether individual spatial channels leading to recognition are functionally optimized for narrowband targets when masked by noise possessing naturalistic image statistics (β=2.0). The current study therefore explores the impact of variable β noise masks on the identification of narrowband target stimuli ranging in spatial complexity, while simultaneously controlling for physical or perceived differences between the masks. The results show that β=2.0 noise masks produce the largest identification thresholds regardless of target complexity, and thus do not seem to yield functionally optimized channel processing. The differential masking effects are discussed in the context of contrast gain control. Copyright © 2012 Elsevier Ltd. All rights reserved.

Method of fabricating a 3-dimensional tool master

DOEpatents

Bonivert, William D.; Hachman, John T.

2002-01-01

The invention is a method for the fabrication of an imprint tool master. The process begins with a metallic substrate. A layer of photoresist is placed onto the metallic substrate and a image pattern mask is then aligned to the mask. The mask pattern has opaque portions that block exposure light and "open" or transparent portions which transmit exposure light. The photoresist layer is then exposed to light transmitted through the "open" portions of the first image pattern mask and the mask is then removed. A second layer of photoresist then can be placed onto the first photoresist layer and a second image pattern mask may be placed on the second layer of photoresist. The second layer of photoresist is exposed to light, as before, and the second mask removed. The photoresist layers are developed simultaneously to produce a multi-level master mandrel upon which a conductive film is formed. A tool master can now be formed onto the conductive film. An imprint tool is then produced from the tool master. In one embodiment, nickel is electroplated onto the tool master to produce a three-dimensional imprint tool.

New mask technology challenges

NASA Astrophysics Data System (ADS)

Kimmel, Kurt R.

2001-09-01

Mask technology development has accelerated dramatically in recent years from the glacial pace of the last three decades to the rapid and sometimes simultaneous introductions of new wavelengths and mask-based resolution enhancement techniques. The nature of the semiconductor business has also become one driven by time-to-market as an overwhelming factor in capturing market share and profit. These are among the factors that have created enormous stress on the mask industry to produce masks with enhanced capabilities, such as phase-shifting attenuators, sub-resolution assist bars, and optical proximity correction (OPC) features, while maintaining or reducing cost and cycle time. The mask can no longer be considered a commodity item that is purchased form the lowest-cost supplier. Instead, it must now be promoted as an integral part of the technical and business case for a total lithographic solution. Improving partnership between designer, mask-maker, and wafer lithographer will be the harbinger of success in finding a profitable balance of capability, cost, and cycle time. Likewise for equipment infrastructure development, stronger partnership on the international level is necessary to control development cost and mitigate schedule and technical risks.

Method for partially coating laser diode facets

NASA Technical Reports Server (NTRS)

Dholakia, Anil R. (Inventor)

1990-01-01

Bars of integral laser diode devices cleaved from a wafer are placed with their p regions abutting and n regions abutting. A thin BeCu mask having alternate openings and strips of the same width as the end facets is used to mask the n region interfaces so that multiple bars can be partially coated over their exposed p regions with a reflective or partial reflective coating. The partial coating permits identification of the emitting facet from the fully coated back facet during a later device mounting procedure.

Low thermal distortion Extreme-UV lithography reticle and method

DOEpatents

Gianoulakis, Steven E.; Ray-Chaudhuri, Avijit K.

2002-01-01

Thermal distortion of reticles or masks can be significantly reduced by emissivity engineering, i.e., the selective placement or omission of coatings on the reticle. Reflective reticles so fabricated exhibit enhanced heat transfer thereby reducing the level of thermal distortion and ultimately improving the quality of the transcription of the reticle pattern onto the wafer. Reflective reticles include a substrate having an active region that defines the mask pattern and non-active region(s) that are characterized by a surface that has a higher emissivity than that of the active region. The non-active regions are not coated with the radiation reflective material.

Simultaneous imaging of neural activity in three dimensions

PubMed Central

Quirin, Sean; Jackson, Jesse; Peterka, Darcy S.; Yuste, Rafael

2014-01-01

We introduce a scanless optical method to image neuronal activity in three dimensions simultaneously. Using a spatial light modulator and a custom-designed phase mask, we illuminate and collect light simultaneously from different focal planes and perform calcium imaging of neuronal activity in vitro and in vivo. This method, combining structured illumination with volume projection imaging, could be used as a technological platform for brain activity mapping. PMID:24772066

An analysis of the masking of speech by competing speech using self-report data.

PubMed

Agus, Trevor R; Akeroyd, Michael A; Noble, William; Bhullar, Navjot

2009-01-01

Many of the items in the "Speech, Spatial, and Qualities of Hearing" scale questionnaire [S. Gatehouse and W. Noble, Int. J. Audiol. 43, 85-99 (2004)] are concerned with speech understanding in a variety of backgrounds, both speech and nonspeech. To study if this self-report data reflected informational masking, previously collected data on 414 people were analyzed. The lowest scores (greatest difficulties) were found for the two items in which there were two speech targets, with successively higher scores for competing speech (six items), energetic masking (one item), and no masking (three items). The results suggest significant masking by competing speech in everyday listening situations.

Masked-backlighter technique used to simultaneously image x-ray absorption and x-ray emission from an inertial confinement fusion plasma.

PubMed

Marshall, F J; Radha, P B

2014-11-01

A method to simultaneously image both the absorption and the self-emission of an imploding inertial confinement fusion plasma has been demonstrated on the OMEGA Laser System. The technique involves the use of a high-Z backlighter, half of which is covered with a low-Z material, and a high-speed x-ray framing camera aligned to capture images backlit by this masked backlighter. Two strips of the four-strip framing camera record images backlit by the high-Z portion of the backlighter, while the other two strips record images aligned with the low-Z portion of the backlighter. The emission from the low-Z material is effectively eliminated by a high-Z filter positioned in front of the framing camera, limiting the detected backlighter emission to that of the principal emission line of the high-Z material. As a result, half of the images are of self-emission from the plasma and the other half are of self-emission plus the backlighter. The advantage of this technique is that the self-emission simultaneous with backlighter absorption is independently measured from a nearby direction. The absorption occurs only in the high-Z backlit frames and is either spatially separated from the emission or the self-emission is suppressed by filtering, or by using a backlighter much brighter than the self-emission, or by subtraction. The masked-backlighter technique has been used on the OMEGA Laser System to simultaneously measure the emission profiles and the absorption profiles of polar-driven implosions.

African Mask-Making Workshop: Professional Development Experiences of Diverse Participants

ERIC Educational Resources Information Center

Rule, Audrey C.; Montgomery, Sarah E.; Kirkland-Holmes, Gloria; Watson, Dwight C.; Ayesiga, Yvonne

2015-01-01

Diverse education professionals learned about African cultures in a workshop experience by making African masks using authentic symbolism. Analysis of reflections to evaluate the workshop for applicability to participants with and without African heritage showed that both groups expanded their cultural knowledge of traditional African ethnic…

Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application

PubMed Central

2009-01-01

We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160–200 nm and a height of 140–150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen. PMID:20596409

Can the meaning of multiple words be integrated unconsciously?

PubMed

van Gaal, Simon; Naccache, Lionel; Meuwese, Julia D I; van Loon, Anouk M; Leighton, Alexandra H; Cohen, Laurent; Dehaene, Stanislas

2014-05-05

What are the limits of unconscious language processing? Can language circuits process simple grammatical constructions unconsciously and integrate the meaning of several unseen words? Using behavioural priming and electroencephalography (EEG), we studied a specific rule-based linguistic operation traditionally thought to require conscious cognitive control: the negation of valence. In a masked priming paradigm, two masked words were successively (Experiment 1) or simultaneously presented (Experiment 2), a modifier ('not'/'very') and an adjective (e.g. 'good'/'bad'), followed by a visible target noun (e.g. 'peace'/'murder'). Subjects indicated whether the target noun had a positive or negative valence. The combination of these three words could either be contextually consistent (e.g. 'very bad - murder') or inconsistent (e.g. 'not bad - murder'). EEG recordings revealed that grammatical negations could unfold partly unconsciously, as reflected in similar occipito-parietal N400 effects for conscious and unconscious three-word sequences forming inconsistent combinations. However, only conscious word sequences elicited P600 effects, later in time. Overall, these results suggest that multiple unconscious words can be rapidly integrated and that an unconscious negation can automatically 'flip the sign' of an unconscious adjective. These findings not only extend the limits of subliminal combinatorial language processes, but also highlight how consciousness modulates the grammatical integration of multiple words.

High-emulation mask recognition with high-resolution hyperspectral video capture system

NASA Astrophysics Data System (ADS)

Feng, Jiao; Fang, Xiaojing; Li, Shoufeng; Wang, Yongjin

2014-11-01

We present a method for distinguishing human face from high-emulation mask, which is increasingly used by criminals for activities such as stealing card numbers and passwords on ATM. Traditional facial recognition technique is difficult to detect such camouflaged criminals. In this paper, we use the high-resolution hyperspectral video capture system to detect high-emulation mask. A RGB camera is used for traditional facial recognition. A prism and a gray scale camera are used to capture spectral information of the observed face. Experiments show that mask made of silica gel has different spectral reflectance compared with the human skin. As multispectral image offers additional spectral information about physical characteristics, high-emulation mask can be easily recognized.

Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application

DOEpatents

Barbee, Jr., Troy W.; Bajt, Sasa

2002-01-01

The reflectivity and thermal stability of Mo/Si (molybdenum/silicon) multilayer films, used in soft x-ray and extreme ultraviolet region, is enhanced by deposition of a thin layer of boron carbide (e.g., B.sub.4 C) between alternating layers of Mo and Si. The invention is useful for reflective coatings for soft X-ray and extreme ultraviolet optics, multilayer for masks, coatings for other wavelengths and multilayers for masks that are more thermally stable than pure Mo/Si multilayers

Ipsilateral masking between acoustic and electric stimulations.

PubMed

Lin, Payton; Turner, Christopher W; Gantz, Bruce J; Djalilian, Hamid R; Zeng, Fan-Gang

2011-08-01

Residual acoustic hearing can be preserved in the same ear following cochlear implantation with minimally traumatic surgical techniques and short-electrode arrays. The combined electric-acoustic stimulation significantly improves cochlear implant performance, particularly speech recognition in noise. The present study measures simultaneous masking by electric pulses on acoustic pure tones, or vice versa, to investigate electric-acoustic interactions and their underlying psychophysical mechanisms. Six subjects, with acoustic hearing preserved at low frequencies in their implanted ear, participated in the study. One subject had a fully inserted 24 mm Nucleus Freedom array and five subjects had Iowa/Nucleus hybrid implants that were only 10 mm in length. Electric masking data of the long-electrode subject showed that stimulation from the most apical electrodes produced threshold elevations over 10 dB for 500, 625, and 750 Hz probe tones, but no elevation for 125 and 250 Hz tones. On the contrary, electric stimulation did not produce any electric masking in the short-electrode subjects. In the acoustic masking experiment, 125-750 Hz pure tones were used to acoustically mask electric stimulation. The acoustic masking results showed that, independent of pure tone frequency, both long- and short-electrode subjects showed threshold elevations at apical and basal electrodes. The present results can be interpreted in terms of underlying physiological mechanisms related to either place-dependent peripheral masking or place-independent central masking.

VUV lithography

DOEpatents

George, Edward V.; Oster, Yale; Mundinger, David C.

1990-01-01

Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1700-1300A using xenon, krypton or argon; shorter wavelengths of 850-650A can be obtained using neon or helium. A thin solid layer of the gas is formed on a cryogenically cooled plate and bombarded with an e-beam to cause fluorescence. The UV reduction camera utilizes multilayer mirrors having high reflectivity at the UV wavelength and images the mask onto a resist coated substrate at a preselected demagnification. The mask can be formed integrally with the source as an emitting mask.

Optimized phase mask to realize retro-reflection reduction for optical systems

NASA Astrophysics Data System (ADS)

He, Sifeng; Gong, Mali

2017-10-01

Aiming at the threats to the active laser detection systems of electro-optical devices due to the cat-eye effect, a novel solution is put forward to realize retro-reflection reduction in this paper. According to the demands of both cat-eye effect reduction and the image quality maintenance of electro-optical devices, a symmetric phase mask is achieved from a stationary phase method and a fast Fourier transform algorithm. Then, based on a comparison of peak normalized cross-correlation (PNCC) between the different defocus parameters, the optimal imaging position can be obtained. After modification with the designed phase mask, the cat-eye effect peak intensity can be reduced by two orders of magnitude while maintaining good image quality and high modulation transfer function (MTF). Furthermore, a practical design example is introduced to demonstrate the feasibility of our proposed approach.

Objective evaluation of the knocking sound of a diesel engine considering the temporal and frequency masking effect simultaneously

NASA Astrophysics Data System (ADS)

Yun, Dong-Un; Lee, Sang-Kwon

2017-06-01

In this paper, we present a novel method for an objective evaluation of knocking noise emitted by diesel engines based on the temporal and frequency masking theory. The knocking sound of a diesel engine is a vibro-acoustic sound correlated with the high-frequency resonances of the engine structure and a periodic impulsive sound with amplitude modulation. Its period is related to the engine speed and includes specific frequency bands related to the resonances of the engine structure. A knocking sound with the characteristics of a high-frequency impulsive wave can be masked by low-frequency sounds correlated with the harmonics of the firing frequency and broadband noise. The degree of modulation of the knocking sound signal was used for such objective evaluations in previous studies, without considering the masking effect. However, the frequency masking effect must be considered for the objective evaluation of the knocking sound. In addition to the frequency masking effect, the temporal masking effect occurs because the period of the knocking sound changes according to the engine speed. Therefore, an evaluation method considering the temporal and frequency masking effect is required to analyze the knocking sound objectively. In this study, an objective evaluation method considering the masking effect was developed based on the masking theory of sound and signal processing techniques. The method was applied successfully for the objective evaluation of the knocking sound of a diesel engine.

Fabrication of coronagraph masks and laboratory scale star-shade masks: characteristics, defects, and performance

NASA Astrophysics Data System (ADS)

Balasubramanian, Kunjithapatham; Riggs, A. J. Eldorado; Cady, Eric; White, Victor; Yee, Karl; Wilson, Daniel; Echternach, Pierre; Muller, Richard; Mejia Prada, Camilo; Seo, Byoung-Joon; Shi, Fang; Ryan, Daniel; Fregoso, Santos; Metzman, Jacob; Wilson, Robert Casey

2017-09-01

NASA WFIRST mission has planned to include a coronagraph instrument to find and characterize exoplanets. Masks are needed to suppress the host star light to better than 10-8 - 10-9 level contrast over a broad bandwidth to enable the coronagraph mission objectives. Such masks for high contrast coronagraphic imaging require various fabrication technologies to meet a wide range of specifications, including precise shapes, micron scale island features, ultra-low reflectivity regions, uniformity, wave front quality, etc. We present the technologies employed at JPL to produce these pupil plane and image plane coronagraph masks, and lab-scale external occulter masks, highlighting accomplishments from the high contrast imaging testbed (HCIT) at JPL and from the high contrast imaging lab (HCIL) at Princeton University. Inherent systematic and random errors in fabrication and their impact on coronagraph performance are discussed with model predictions and measurements.

Pattern Inspection of EUV Masks Using DUV Light

NASA Astrophysics Data System (ADS)

Liang, Ted; Tejnil, Edita; Stivers, Alan R.

2002-12-01

Inspection of extreme ultraviolet (EUV) lithography masks requires reflected light and this poses special challenges for inspection tool suppliers as well as for mask makers. Inspection must detect all the printable defects in the absorber pattern as well as printable process-related defects. Progress has been made under the NIST ATP project on "Intelligent Mask Inspection Systems for Next Generation Lithography" in assessing the factors that impact the inspection tool sensitivity. We report in this paper the inspection of EUV masks with programmed absorber defects using 257nm light. All the materials of interests for masks are highly absorptive to EUV light as compared to deep ultraviolet (DUV) light. Residues and contamination from mask fabrication process and handling are prone to be printable. Therefore, it is critical to understand their EUV printability and optical inspectability. Process related defects may include residual buffer layer such as oxide, organic contaminants and possible over-etch to the multilayer surface. Both simulation and experimental results will be presented in this paper.

Electrophysiological evidence for size invariance in masked picture repetition priming

PubMed Central

Eddy, Marianna D.; Holcomb, Phillip J.

2009-01-01

This experiment examined invariance in object representations through measuring event-related potentials (ERPs) to pictures in a masked repetition priming paradigm. Pairs of pictures were presented where the prime was either the same size or half the size of the target object and the target was either presented in a normal orientation or was a normal sized mirror reflection of the prime object. Previous masked repetition priming studies have found a cascade of priming effect sensitive to perceptual (N190/P190) and semantic (N400) properties of the stimulus. This experiment found that both early (N190/P190 effects) and later effects (N400) were invariant to size, whereas only the N190/P190 effect was invariant to mirror reflection. The combination of a small prime and a mirror reflected target led to no significant priming effects. Taken together, the results of this set of experiments suggests that object recognition, more specifically, activating an object representation, occurs in a hierarchical fashion where overlapping perceptual information between the prime and target is necessary, although not always sufficient, to activate a higher level semantic representation. PMID:19560248

Attentional capture by masked colour singletons.

PubMed

Ansorge, Ulrich; Horstmann, Gernot; Worschech, Franziska

2010-09-15

We tested under which conditions a colour singleton of which an observer is unaware captures attention. To prevent visual awareness of the colour singleton, we used backward masking. We find that a masked colour singleton cue captures attention if it matches the observer's goal to search for target colours but not if it is task-irrelevant. This is also reflected in event-related potentials to the visible target: the masked goal-matching cue elicits an attentional potential (N2pc) in a target search task. By contrast, a non-matching but equally strong masked colour singleton cue failed to elicit a capture effect and an N2pc. Results are discussed with regard to currently pertaining conceptions of attentional capture by colour singletons. Copyright 2010 Elsevier Ltd. All rights reserved.

Effect of attention on the detection and identification of masked spatial patterns.

PubMed

Põder, Endel

2005-01-01

The effect of attention on the detection and identification of vertically and horizontally oriented Gabor patterns in the condition of simultaneous masking with obliquely oriented Gabors was studied. Attention was manipulated by varying the set size in a visual-search experiment. In the first experiment, small target Gabors were presented on the background of larger masking Gabors. In the detection task, the effect of set size was as predicted by unlimited-capacity signal detection theory. In the orientation identification task, increasing the set size from 1 to 8 resulted in a much larger decline in performance. The results of the additional experiments suggest that attention can reduce the crowding effect of maskers.

Contributions of Sensory Coding and Attentional Control to Individual Differences in Performance in Spatial Auditory Selective Attention Tasks.

PubMed

Dai, Lengshi; Shinn-Cunningham, Barbara G

2016-01-01

Listeners with normal hearing thresholds (NHTs) differ in their ability to steer attention to whatever sound source is important. This ability depends on top-down executive control, which modulates the sensory representation of sound in the cortex. Yet, this sensory representation also depends on the coding fidelity of the peripheral auditory system. Both of these factors may thus contribute to the individual differences in performance. We designed a selective auditory attention paradigm in which we could simultaneously measure envelope following responses (EFRs, reflecting peripheral coding), onset event-related potentials (ERPs) from the scalp (reflecting cortical responses to sound) and behavioral scores. We performed two experiments that varied stimulus conditions to alter the degree to which performance might be limited due to fine stimulus details vs. due to control of attentional focus. Consistent with past work, in both experiments we find that attention strongly modulates cortical ERPs. Importantly, in Experiment I, where coding fidelity limits the task, individual behavioral performance correlates with subcortical coding strength (derived by computing how the EFR is degraded for fully masked tones compared to partially masked tones); however, in this experiment, the effects of attention on cortical ERPs were unrelated to individual subject performance. In contrast, in Experiment II, where sensory cues for segregation are robust (and thus less of a limiting factor on task performance), inter-subject behavioral differences correlate with subcortical coding strength. In addition, after factoring out the influence of subcortical coding strength, behavioral differences are also correlated with the strength of attentional modulation of ERPs. These results support the hypothesis that behavioral abilities amongst listeners with NHTs can arise due to both subcortical coding differences and differences in attentional control, depending on stimulus characteristics and task demands.

Control of spectral transmission enhancement properties of random anti-reflecting surface structures fabricated using gold masking

NASA Astrophysics Data System (ADS)

Peltier, Abigail; Sapkota, Gopal; Potter, Matthew; Busse, Lynda E.; Frantz, Jesse A.; Shaw, L. Brandon; Sanghera, Jasbinder S.; Aggarwal, Ishwar D.; Poutous, Menelaos K.

2017-02-01

Random anti-reflecting subwavelength surface structures (rARSS) have been shown to suppress Fresnel reflection and scatter from optical surfaces. The structures effectively function as a gradient-refractive-index at the substrate boundary, and the spectral transmission properties of the boundary have been shown to depend on the structure's statistical properties (diameter, height, and density.) We fabricated rARSS on fused silica substrates using gold masking. A thin layer of gold was deposited on the surface of the substrate and then subjected to a rapid thermal annealing (RTA) process at various temperatures. This RTA process resulted in the formation of gold "islands" on the surface of the substrate, which then acted as a mask while the substrate was dry etched in a reactive ion etching (RIE) process. The plasma etch yielded a fused silica surface covered with randomly arranged "rods" that act as the anti-reflective layer. We present data relating the physical characteristics of the gold "island" statistical populations, and the resulting rARSS "rod" population, as well as, optical scattering losses and spectral transmission properties of the final surfaces. We focus on comparing results between samples processed at different RTA temperatures, as well as samples fabricated without undergoing RTA, to relate fabrication process statistics to transmission enhancement values.

Removing Our Masks: Using the Visual and Performing Arts to Promote Deep Reflection in Pre-Service Teachers

ERIC Educational Resources Information Center

McHattan, Patty Alvarez; McCray, Erica D.

2009-01-01

The role of reflection is central to teacher preparation. As individuals integrate new information within their existing schema, they refine their practice. Through reflection pre-service teachers examine, evaluate, and adjust. Yet, the practice of reflection is rarely explicitly taught. Often teacher educators found their students aligning their…

VUV lithography

DOEpatents

George, E.V.; Oster, Y.; Mundinger, D.C.

1990-12-25

Deep UV projection lithography can be performed using an e-beam pumped solid excimer UV source, a mask, and a UV reduction camera. The UV source produces deep UV radiation in the range 1,700--1,300A using xenon, krypton or argon; shorter wavelengths of 850--650A can be obtained using neon or helium. A thin solid layer of the gas is formed on a cryogenically cooled plate and bombarded with an e-beam to cause fluorescence. The UV reduction camera utilizes multilayer mirrors having high reflectivity at the UV wavelength and images the mask onto a resist coated substrate at a preselected demagnification. The mask can be formed integrally with the source as an emitting mask. 6 figs.

Dynamics of normalization underlying masking in human visual cortex.

PubMed

Tsai, Jeffrey J; Wade, Alex R; Norcia, Anthony M

2012-02-22

Stimulus visibility can be reduced by other stimuli that overlap the same region of visual space, a process known as masking. Here we studied the neural mechanisms of masking in humans using source-imaged steady state visual evoked potentials and frequency-domain analysis over a wide range of relative stimulus strengths of test and mask stimuli. Test and mask stimuli were tagged with distinct temporal frequencies and we quantified spectral response components associated with the individual stimuli (self terms) and responses due to interaction between stimuli (intermodulation terms). In early visual cortex, masking alters the self terms in a manner consistent with a reduction of input contrast. We also identify a novel signature of masking: a robust intermodulation term that peaks when the test and mask stimuli have equal contrast and disappears when they are widely different. We fit all of our data simultaneously with family of a divisive gain control models that differed only in their dynamics. Models with either very short or very long temporal integration constants for the gain pool performed worse than a model with an integration time of ∼30 ms. Finally, the absolute magnitudes of the response were controlled by the ratio of the stimulus contrasts, not their absolute values. This contrast-contrast invariance suggests that many neurons in early visual cortex code relative rather than absolute contrast. Together, these results provide a more complete description of masking within the normalization framework of contrast gain control and suggest that contrast normalization accomplishes multiple functional goals.

More Realistic Face Model Surface Improves Relevance of Pediatric In-Vitro Aerosol Studies.

PubMed

Amirav, Israel; Halamish, Asaf; Gorenberg, Miguel; Omar, Hamza; Newhouse, Michael T

2015-01-01

Various hard face models are commonly used to evaluate the efficiency of aerosol face masks. Softer more realistic "face" surface materials, like skin, deform upon mask application and should provide more relevant in-vitro tests. Studies that simultaneously take into consideration many of the factors characteristic of the in vivo face are lacking. These include airways, various application forces, comparison of various devices, comparison with a hard-surface model and use of a more representative model face based on large numbers of actual faces. To compare mask to "face" seal and aerosol delivery of two pediatric masks using a soft vs. a hard, appropriately representative, pediatric face model under various applied forces. Two identical face models and upper airways replicas were constructed, the only difference being the suppleness and compressibility of the surface layer of the "face." Integrity of the seal and aerosol delivery of two different masks [AeroChamber (AC) and SootherMask (SM)] were compared using a breath simulator, filter collection and realistic applied forces. The soft "face" significantly increased the delivery efficiency and the sealing characteristics of both masks. Aerosol delivery with the soft "face" was significantly greater for the SM compared to the AC (p< 0.01). No statistically significant difference between the two masks was observed with the hard "face." The material and pliability of the model "face" surface has a significant influence on both the seal and delivery efficiency of face masks. This finding should be taken into account during in-vitro aerosol studies.

Optical inspection of NGL masks

NASA Astrophysics Data System (ADS)

Pettibone, Donald W.; Stokowski, Stanley E.

2004-12-01

For the last five years KLA-Tencor and our joint venture partners have pursued a research program studying the ability of optical inspection tools to meet the inspection needs of possible NGL lithographies. The NGL technologies that we have studied include SCALPEL, PREVAIL, EUV lithography, and Step and Flash Imprint Lithography. We will discuss the sensitivity of the inspection tools and mask design factors that affect tool sensitivity. Most of the work has been directed towards EUV mask inspection and how to optimize the mask to facilitate inspection. Our partners have succeeded in making high contrast EUV masks ranging in contrast from 70% to 98%. Die to die and die to database inspection of EUV masks have been achieved with a sensitivity that is comparable to what can be achieved with conventional photomasks, approximately 80nm defect sensitivity. We have inspected SCALPEL masks successfully. We have found a limitation of optical inspection when applied to PREVAIL stencil masks. We have run inspections on SFIL masks in die to die, reflected light, in an effort to provide feedback to improve the masks. We have used a UV inspection system to inspect both unpatterned EUV substrates (no coatings) and blanks (with EUV multilayer coatings). These inspection results have proven useful in driving down the substrate and blank defect levels.

Forward masking of frequency modulationa

PubMed Central

Byrne, Andrew J.; Wojtczak, Magdalena; Viemeister, Neal F.

2012-01-01

Forward masking of sinusoidal frequency modulation (FM) was measured with three types of maskers: FM, amplitude modulation (AM), and a masker created by combining the magnitude spectrum of an FM tone with random component phases. For the signal FM rates used (5, 20, and 40 Hz), an FM masker raised detection thresholds in terms of frequency deviation by a factor of about 5 relative to without a masker. The AM masker produced a much smaller effect, suggesting that FM-to-AM conversion did not contribute substantially to the FM forward masking. The modulation depth of an FM masker had a nonmonotonic effect, with maximal masking observed at an intermediate value within the range of possible depths, while the random-phase FM masker produced less masking, arguing against a spectrally-based explanation for FM forward masking. Broad FM-rate selectivity for forward masking was observed for both 4-kHz and 500-Hz carriers. Thresholds measured as a function of the masker-signal delay showed slow recovery from FM forward masking, with residual masking for delays up to 500 ms. The FM forward-masking effect resembles that observed for AM [Wojtczak and Viemeister (2005). J. Acoust. Soc. Am. 188, 3198–3210] and may reflect modulation-rate selective neural adaptation to FM. PMID:23145618

Model-based assist feature insertion for sub-40nm memory device

NASA Astrophysics Data System (ADS)

Suh, Sungsoo; Lee, Suk-joo; Choi, Seong-woon; Lee, Sung-Woo; Park, Chan-hoon

2009-04-01

Many issues need to be resolved for a production-worthy model based assist feature insertion flow for single and double exposure patterning process to extend low k1 process at 193 nm immersion technology. Model based assist feature insertion is not trivial to implement either for single and double exposure patterning compared to rule based methods. As shown in Fig. 1, pixel based mask inversion technology in itself has difficulties in mask writing and inspection although it presents as one of key technology to extend single exposure for contact layer. Thus far, inversion technology is tried as a cooptimization of target mask to simultaneously generate optimized main and sub-resolution assists features for a desired process window. Alternatively, its technology can also be used to optimize for a target feature after an assist feature types are inserted in order to simplify the mask complexity. Simplification of inversion mask is one of major issue with applying inversion technology to device development even if a smaller mask feature can be fabricated since the mask writing time is also a major factor. As shown in Figure 2, mask writing time may be a limiting factor in determining whether or not an inversion solution is viable. It can be reasoned that increased number of shot counts relates to increase in margin for inversion methodology. On the other hand, there is a limit on how complex a mask can be in order to be production worthy. There is also source and mask co-optimization which influences the final mask patterns and assist feature sizes and positions for a given target. In this study, we will discuss assist feature insertion methods for sub 40-nm technology.

Novel EUV mask black border and its impact on wafer imaging

NASA Astrophysics Data System (ADS)

Kodera, Yutaka; Fukugami, Norihito; Komizo, Toru; Watanabe, Genta; Ito, Shin; Yoshida, Itaru; Maruyama, Shingo; Kotani, Jun; Konishi, Toshio; Haraguchi, Takashi

2016-03-01

EUV lithography is the most promising technology for semiconductor device manufacturing of the 10nm node and beyond. The EUV mask is a key element in the lithographic scanner optical path. The image border is a pattern free dark area around the die on the photomask serving as transition area between the parts of the mask that is shielded from the exposure light by the Reticle Masking (REMA) blades and the die. When printing a die at dense spacing on an EUV scanner, the EUV light reflection from the image border overlaps edges of neighboring dies, affecting CD and contrast in this area. To reduce this effect an etched multilayer type black border was developed, and it was demonstrated that CD impact at the edge of a die is strongly reduced with this type of the black border (BB). However, wafer printing result still showed some CD change influenced by the black border reflection. It was proven that the CD shift was caused by DUV Out of Band (OOB) light which is emitted from EUV light source. New types of a multilayer etched BB were evaluated and showed a good potential for DUV light suppression. In this study, a novel black border called Hybrid Black Border has been developed which allows to eliminate EUV and DUV OOB light reflection. Direct measurements of OOB light from HBB and Normal BB are performed on NXE:3300B ASML EUV scanner; it is shown that HBB OOB reflection is 3x lower than that of Normal BB. Finally, we state that HBB is a promising technology allowing for CD control at die edges.

Early Evaluation of the VIIRS Calibration, Cloud Mask and Surface Reflectance Earth Data Records

NASA Technical Reports Server (NTRS)

Vermote, Eric; Justice, Chris; Csiszar, Ivan

2014-01-01

Surface reflectance is one of the key products fromVIIRS and as withMODIS, is used in developing several higherorder land products. The VIIRS Surface Reflectance (SR) Intermediate Product (IP) is based on the heritageMODIS Collection 5 product (Vermote, El Saleous, & Justice, 2002). The quality and character of surface reflectance depend on the accuracy of the VIIRS Cloud Mask (VCM), the aerosol algorithms and the adequate calibration of the sensor. The focus of this paper is the early evaluation of the VIIRS SR product in the context of the maturity of the operational processing system, the Interface Data Processing System (IDPS). After a brief introduction, the paper presents the calibration performance and the role of the surface reflectance in calibration monitoring. The analysis of the performance of the cloud mask with a focus on vegetation monitoring (no snow conditions) shows typical problems over bright surfaces and high elevation sites. Also discussed is the performance of the aerosol input used in the atmospheric correction and in particular the artifacts generated by the use of the Navy Aerosol Analysis and Prediction System. Early quantitative results of the performance of the SR product over the AERONET sites showthatwith the fewadjustments recommended, the accuracy iswithin the threshold specifications. The analysis of the adequacy of the SR product (Land PEATE adjusted version) in applications of societal benefits is then presented. We conclude with a set of recommendations to ensure consistency and continuity of the JPSS mission with the MODIS Land Climate Data Record.

Statistical mechanics of image processing by digital halftoning

NASA Astrophysics Data System (ADS)

Inoue, Jun-Ichi; Norimatsu, Wataru; Saika, Yohei; Okada, Masato

2009-03-01

We consider the problem of digital halftoning (DH). The DH is an image processing representing each grayscale in images in terms of black and white dots, and it is achieved by making use of the threshold dither mask, namely, each pixel is determined as black if the grayscale pixel is greater than or equal to the mask value and as white vice versa. To determine the mask for a given grayscale image, we assume that human-eyes might recognize the BW dots as the corresponding grayscale by linear filters. Then, the Hamiltonian is constructed as a distance between the original and recognized images which is written in terms of the mask. Finding the ground state of the Hamiltonian via deterministic annealing, we obtain the optimal mask and the BW dots simultaneously. From the spectrum analysis, we find that the BW dots are desirable from the view point of human-eyes modulation properties. We also show that the lower bound of the mean square error for the inverse process of the DH is minimized on the Nishimori line which is well-known in the research field of spin glasses.

Sunglint Detection for Unmanned and Automated Platforms

PubMed Central

Garaba, Shungudzemwoyo Pascal; Schulz, Jan; Wernand, Marcel Robert; Zielinski, Oliver

2012-01-01

We present an empirical quality control protocol for above-water radiometric sampling focussing on identifying sunglint situations. Using hyperspectral radiometers, measurements were taken on an automated and unmanned seaborne platform in northwest European shelf seas. In parallel, a camera system was used to capture sea surface and sky images of the investigated points. The quality control consists of meteorological flags, to mask dusk, dawn, precipitation and low light conditions, utilizing incoming solar irradiance (ES) spectra. Using 629 from a total of 3,121 spectral measurements that passed the test conditions of the meteorological flagging, a new sunglint flag was developed. To predict sunglint conspicuous in the simultaneously available sea surface images a sunglint image detection algorithm was developed and implemented. Applying this algorithm, two sets of data, one with (having too much or detectable white pixels or sunglint) and one without sunglint (having least visible/detectable white pixel or sunglint), were derived. To identify the most effective sunglint flagging criteria we evaluated the spectral characteristics of these two data sets using water leaving radiance (LW) and remote sensing reflectance (RRS). Spectral conditions satisfying ‘mean LW (700–950 nm) < 2 mW·m−2·nm−1·Sr−1’ or alternatively ‘minimum RRS (700–950 nm) < 0.010 Sr−1’, mask most measurements affected by sunglint, providing an efficient empirical flagging of sunglint in automated quality control.

Coatings on reflective mask substrates

DOEpatents

Tong, William Man-Wai; Taylor, John S.; Hector, Scott D.; Mangat, Pawitter J. S.; Stivers, Alan R.; Kofron, Patrick G.; Thompson, Matthew A.

2002-01-01

A process for creating a mask substrate involving depositing: 1) a coating on one or both sides of a low thermal expansion material EUVL mask substrate to improve defect inspection, surface finishing, and defect levels; and 2) a high dielectric coating, on the backside to facilitate electrostatic chucking and to correct for any bowing caused by the stress imbalance imparted by either other deposited coatings or the multilayer coating of the mask substrate. An film, such as TaSi, may be deposited on the front side and/or back of the low thermal expansion material before the material coating to balance the stress. The low thermal expansion material with a silicon overlayer and a silicon and/or other conductive underlayer enables improved defect inspection and stress balancing.

Progress on EUV mask fabrication for 32-nm technology node and beyond

NASA Astrophysics Data System (ADS)

Zhang, Guojing; Yan, Pei-Yang; Liang, Ted; Park, Seh-jin; Sanchez, Peter; Shu, Emily Y.; Ultanir, Erdem A.; Henrichs, Sven; Stivers, Alan; Vandentop, Gilroy; Lieberman, Barry; Qu, Ping

2007-05-01

Extreme ultraviolet lithography (EUVL) tool development achieved a big milestone last year as two full-field Alpha Demo Tools (ADT) were shipped to customers by ASML. In the future horizon, a full field "EUV1" exposure tool from Nikon will be available by the end of 20071 and the pre-production EUV exposure tools from ASML are targeted for 20092. It is essential that high quality EUVL masks can be made and delivered to the EUVL tool users to support the technology development. In the past year, we have demonstrated mask fabrication with low stress absorber deposition and good etch process control yielding a vertical etch profile and a mask CD control of 5.7 nm for 32 nm (1x) space and 7.4 nm for 32 nm (1x) lines. Mask pattern resolution of 15 nm (1x) dense lines was achieved. Full field reflective mask die-to-die inspection at a 125nm pixel size was demonstrated after low defect multilayer blanks became available. In this paper, we will present details of the Intel EUVL Mask Pilot Line progress in EUVL mask defect reduction, pattern CD performance, program defect mask design and inspection, in-house absorber film development and its performance, and EUVL metrology tool development. We will demonstrate an overall improvement in EUV mask manufacturing readiness due to our Pilot Line activities.

SEMATECH produces defect-free EUV mask blanks: defect yield and immediate challenges

NASA Astrophysics Data System (ADS)

Antohe, Alin O.; Balachandran, Dave; He, Long; Kearney, Patrick; Karumuri, Anil; Goodwin, Frank; Cummings, Kevin

2015-03-01

Availability of defect-free reflective mask has been one of the most critical challenges to extreme ultraviolet lithography (EUVL). To mitigate the risk, significant progress has been made on defect detection, pattern shifting, and defect repair. Clearly such mitigation strategies are based on the assumption that defect counts and sizes from incoming mask blanks must be below practical levels depending on mask specifics. The leading industry consensus for early mask product development is that there should be no defects greater than 80 nm in the quality area, 132 mm x 132 mm. In addition less than 10 defects smaller than 80 nm may be mitigable. SEMATECH has been focused on EUV mask blank defect reduction using Veeco Nexus TM IBD platform, the industry standard for mask blank production, and assessing if IBD technology can be evolved to a manufacturing solution. SEMATECH has recently announced a breakthrough reduction of defects in the mask blank deposition process resulting in the production of two defect-free EUV mask blanks at 54 nm inspection sensitivity (SiO2 equivalent). This paper will discuss the dramatic reduction of baseline EUV mask blank defects, review the current deposition process run and compare results with previous process runs. Likely causes of remaining defects will be discussed based on analyses as characterized by their compositions and whether defects are embedded in the multilayer stack or non-embedded.

More Realistic Face Model Surface Improves Relevance of Pediatric In-Vitro Aerosol Studies

PubMed Central

Amirav, Israel; Halamish, Asaf; Gorenberg, Miguel; Omar, Hamza; Newhouse, Michael T.

2015-01-01

Background Various hard face models are commonly used to evaluate the efficiency of aerosol face masks. Softer more realistic “face” surface materials, like skin, deform upon mask application and should provide more relevant in-vitro tests. Studies that simultaneously take into consideration many of the factors characteristic of the in vivo face are lacking. These include airways, various application forces, comparison of various devices, comparison with a hard-surface model and use of a more representative model face based on large numbers of actual faces. Aim To compare mask to “face” seal and aerosol delivery of two pediatric masks using a soft vs. a hard, appropriately representative, pediatric face model under various applied forces. Methods Two identical face models and upper airways replicas were constructed, the only difference being the suppleness and compressibility of the surface layer of the “face.” Integrity of the seal and aerosol delivery of two different masks [AeroChamber (AC) and SootherMask (SM)] were compared using a breath simulator, filter collection and realistic applied forces. Results The soft “face” significantly increased the delivery efficiency and the sealing characteristics of both masks. Aerosol delivery with the soft “face” was significantly greater for the SM compared to the AC (p< 0.01). No statistically significant difference between the two masks was observed with the hard “face.” Conclusions The material and pliability of the model “face” surface has a significant influence on both the seal and delivery efficiency of face masks. This finding should be taken into account during in-vitro aerosol studies. PMID:26090661

Human frequency-following response to speech-like sounds: correlates of off-frequency masking.

PubMed

Krishnan, Ananthanarayan; Agrawal, Smita

2010-01-01

Off-frequency masking of the second formant by energy at the first formant has been shown to influence both identification and discrimination of the second formant in normal-hearing and hearing-impaired listeners. While both excitatory spread and two-tone suppression have been implicated in this simultaneous masking, their relative contribution has been shown to depend on both the level of the masker and the frequency separation between the probe and the masker. Off-frequency masking effects were evaluated in 10 normal-hearing human adults using the frequency-following response (FFR) to two two-tone approximations of vowel stimuli (/a/ and /u/). In the first experiment, the masking effect of F(1) on F(2) was evaluated by attenuating the level of F(1) relative to a fixed F(2) level. In the second experiment, the masking effect was evaluated by increasing the frequency separation between F(1) and F(2) using F(2) frequency as the variable. Results revealed that both attenuation of the F(1) level, and increasing the frequency separation between F(1) and F(2) increased the magnitude of the FFR component at F(2). These results are consistent with a release from off-frequency masking. Given that the results presented here are for high signal and masker levels and for relatively smaller frequency separation between the masker and the probe, it is possible that both suppression and excitatory spread contributed to the masking effects observed in our data. Copyright2009 S. Karger AG, Basel.

Simultaneous sequential monitoring of efficacy and safety led to masking of effects.

PubMed

van Eekelen, Rik; de Hoop, Esther; van der Tweel, Ingeborg

2016-08-01

Usually, sequential designs for clinical trials are applied on the primary (=efficacy) outcome. In practice, other outcomes (e.g., safety) will also be monitored and influence the decision whether to stop a trial early. Implications of simultaneous monitoring on trial decision making are yet unclear. This study examines what happens to the type I error, power, and required sample sizes when one efficacy outcome and one correlated safety outcome are monitored simultaneously using sequential designs. We conducted a simulation study in the framework of a two-arm parallel clinical trial. Interim analyses on two outcomes were performed independently and simultaneously on the same data sets using four sequential monitoring designs, including O'Brien-Fleming and Triangular Test boundaries. Simulations differed in values for correlations and true effect sizes. When an effect was present in both outcomes, competition was introduced, which decreased power (e.g., from 80% to 60%). Futility boundaries for the efficacy outcome reduced overall type I errors as well as power for the safety outcome. Monitoring two correlated outcomes, given that both are essential for early trial termination, leads to masking of true effects. Careful consideration of scenarios must be taken into account when designing sequential trials. Simulation results can help guide trial design. Copyright © 2016 Elsevier Inc. All rights reserved.

Carbon contamination topography analysis of EUV masks

DOE Office of Scientific and Technical Information (OSTI.GOV)

Fan, Y.-J.; Yankulin, L.; Thomas, P.

2010-03-12

The impact of carbon contamination on extreme ultraviolet (EUV) masks is significant due to throughput loss and potential effects on imaging performance. Current carbon contamination research primarily focuses on the lifetime of the multilayer surfaces, determined by reflectivity loss and reduced throughput in EUV exposure tools. However, contamination on patterned EUV masks can cause additional effects on absorbing features and the printed images, as well as impacting the efficiency of cleaning process. In this work, several different techniques were used to determine possible contamination topography. Lithographic simulations were also performed and the results compared with the experimental data.

Factors responsible for remote-frequency masking in children and adultsa)

PubMed Central

Leibold, Lori J.; Buss, Emily

2016-01-01

Susceptibility to remote-frequency masking in children and adults was evaluated with respect to three stimulus features: (1) masker bandwidth, (2) spectral separation of the signal and masker, and (3) gated versus continuous masker presentation. Listeners were 4- to 6-year-olds, 7- to 10-year-olds, and adults. Detection thresholds for a 500-ms, 2000-Hz signal were estimated in quiet or presented with a band of noise in one of four frequency regions: 425–500 Hz, 4000–4075 Hz, 8000–8075 Hz, or 4000–10 000 Hz. In experiment 1, maskers were gated on in each 500-ms interval of a three-interval, forced-choice adaptive procedure. Masking was observed for all ages in all maskers, but the greatest masking was observed for the 4000–4075 Hz masker. These findings suggest that signal/masker spectral proximity plays an important role in remote-frequency masking, even when peripheral excitation associated with the signal and masker does not overlap. Younger children tended to have more masking than older children or adults, consistent with a reduced ability to segregate simultaneous sounds and/or listen in a frequency-selective manner. In experiment 2, detection thresholds were estimated in the same noises, but maskers were presented continuously. Masking was reduced for all ages relative to gated conditions, suggesting improved segregation and/or frequency-selective listening. PMID:28040030

Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance

NASA Astrophysics Data System (ADS)

Dietze, Uwe; Dress, Peter; Waehler, Tobias; Singh, Sherjang; Jonckheere, Rik; Baudemprez, Bart

2011-03-01

Extreme Ultraviolet Lithography (EUVL) is considered the leading lithography technology choice for semiconductor devices at 16nm HP node and beyond. However, before EUV Lithography can enter into High Volume Manufacturing (HVM) of advanced semiconductor devices, the ability to guarantee mask integrity at point-of-exposure must be established. Highly efficient, damage free mask cleaning plays a critical role during the mask manufacturing cycle and throughout the life of the mask, where the absence of a pellicle to protect the EUV mask increases the risk of contamination during storage, handling and use. In this paper, we will present effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance, which employs an intelligent, holistic approach to maximize Mean Time Between Cleans (MBTC) and extend the useful life span of the reticle. The data presented will demonstrate the protection of the capping and absorber layers, preservation of pattern integrity as well as optical and mechanical properties to avoid unpredictable CD-linewidth and overlay shifts. Experiments were performed on EUV blanks and pattern masks using various process conditions. Conditions showing high particle removal efficiency (PRE) and minimum surface layer impact were then selected for durability studies. Surface layer impact was evaluated over multiple cleaning cycles by means of UV reflectivity metrology XPS analysis and wafer prints. Experimental results were compared to computational models. Mask life time predictions where made using the same computational models. The paper will provide a generic overview of the cleaning sequence which yielded best results, but will also provide recommendations for an efficient in-fab mask maintenance scheme, addressing handling, storage, cleaning and inspection.

Excitation-based and informational masking of a tonal signal in a four-tone masker.

PubMed

Leibold, Lori J; Hitchens, Jack J; Buss, Emily; Neff, Donna L

2010-04-01

This study examined contributions of peripheral excitation and informational masking to the variability in masking effectiveness observed across samples of multi-tonal maskers. Detection thresholds were measured for a 1000-Hz signal presented simultaneously with each of 25, four-tone masker samples. Using a two-interval, forced-choice adaptive task, thresholds were measured with each sample fixed throughout trial blocks for ten listeners. Average thresholds differed by as much as 26 dB across samples. An excitation-based model of partial loudness [Moore, B. C. J. et al. (1997). J. Audio Eng. Soc. 45, 224-237] was used to predict thresholds. These predictions accounted for a significant portion of variance in the data of several listeners, but no relation between the model and data was observed for many listeners. Moreover, substantial individual differences, on the order of 41 dB, were observed for some maskers. The largest individual differences were found for maskers predicted to produce minimal excitation-based masking. In subsequent conditions, one of five maskers was randomly presented in each interval. The difference in performance for samples with low versus high predicted thresholds was reduced in random compared to fixed conditions. These findings are consistent with a trading relation whereby informational masking is largest for conditions in which excitation-based masking is smallest.

Extreme ultraviolet patterned mask inspection performance of advanced projection electron microscope system for 11nm half-pitch generation

NASA Astrophysics Data System (ADS)

Hirano, Ryoichi; Iida, Susumu; Amano, Tsuyoshi; Watanabe, Hidehiro; Hatakeyama, Masahiro; Murakami, Takeshi; Suematsu, Kenichi; Terao, Kenji

2016-03-01

Novel projection electron microscope optics have been developed and integrated into a new inspection system named EBEYE-V30 ("Model EBEYE" is an EBARA's model code) , and the resulting system shows promise for application to half-pitch (hp) 16-nm node extreme ultraviolet lithography (EUVL) patterned mask inspection. To improve the system's inspection throughput for 11-nm hp generation defect detection, a new electron-sensitive area image sensor with a high-speed data processing unit, a bright and stable electron source, and an image capture area deflector that operates simultaneously with the mask scanning motion have been developed. A learning system has been used for the mask inspection tool to meet the requirements of hp 11-nm node EUV patterned mask inspection. Defects are identified by the projection electron microscope system using the "defectivity" from the characteristics of the acquired image. The learning system has been developed to reduce the labor and costs associated with adjustment of the detection capability to cope with newly-defined mask defects. We describe the integration of the developed elements into the inspection tool and the verification of the designed specification. We have also verified the effectiveness of the learning system, which shows enhanced detection capability for the hp 11-nm node.

Depth map generation using a single image sensor with phase masks.

PubMed

Jang, Jinbeum; Park, Sangwoo; Jo, Jieun; Paik, Joonki

2016-06-13

Conventional stereo matching systems generate a depth map using two or more digital imaging sensors. It is difficult to use the small camera system because of their high costs and bulky sizes. In order to solve this problem, this paper presents a stereo matching system using a single image sensor with phase masks for the phase difference auto-focusing. A novel pattern of phase mask array is proposed to simultaneously acquire two pairs of stereo images. Furthermore, a noise-invariant depth map is generated from the raw format sensor output. The proposed method consists of four steps to compute the depth map: (i) acquisition of stereo images using the proposed mask array, (ii) variational segmentation using merging criteria to simplify the input image, (iii) disparity map generation using the hierarchical block matching for disparity measurement, and (iv) image matting to fill holes to generate the dense depth map. The proposed system can be used in small digital cameras without additional lenses or sensors.

Attention and positive affect: temporal switching or spatial broadening?

PubMed

Phaf, R Hans

2015-04-01

Evolutionary reasoning and computation suggest that positive affect is associated with higher attentional flexibility than negative affect, even when affectively neutral material is processed. The affective modulation of interference in the Eriksen flanker task seems, however, more readily explained by a spatial broadening of attention due to positive affect. It is argued here that these results should also be interpreted in terms of an increased switching over time between flankers and target (i.e., flexibility). The two hypotheses were contrasted with positive and negative mood inductions in a masked-flanker task. The interval (Stimulus Onset Asynchrony; SOA) with which the masked flankers preceded the target letter was parametrically varied. In contrast to what is found with simultaneous non-masked flanker presentation, masking produced larger interference with negative than with positive moods. In addition, a crossover interaction between mood and SOA emerged. These results seem incompatible with a spatial broadening account and support an affective modulation account in terms of flexibility.

Optimal mask characterization by Surrogate Wafer Print (SWaP) method

NASA Astrophysics Data System (ADS)

Kimmel, Kurt R.; Hoellein, Ingo; Peters, Jan Hendrick; Ackmann, Paul; Connolly, Brid; West, Craig

2008-10-01

Traditionally, definition of mask specifications is done completely by the mask user, while characterization of the mask relative to the specifications is done completely by the mask maker. As the challenges of low-k1 imaging continue to grow in scope of designs and in absolute complexity, the inevitable partnership between wafer lithographers and mask makers has strengthened as well. This is reflected in the jointly owned mask facilities and device manufacturers' continued maintenance of fully captive mask shops which foster the closer mask-litho relationships. However, while some device manufacturers have leveraged this to optimize mask specifications before the mask is built and, therefore, improve mask yield and cost, the opportunity for post-fabrication partnering on mask characterization is more apparent and compelling. The Advanced Mask Technology Center (AMTC) has been investigating the concept of assessing how a mask images, rather than the mask's physical attributes, as a technically superior and lower-cost method to characterize a mask. The idea of printing a mask under its intended imaging conditions, then characterizing the imaged wafer as a surrogate for traditional mask inspections and measurements represents the ultimate method to characterize a mask's performance, which is most meaningful to the user. Surrogate wafer print (SWaP) is already done as part of leading-edge wafer fab mask qualification to validate defect and dimensional performance. In the past, the prospect of executing this concept has generally been summarily discarded as technically untenable and logistically intractable. The AMTC published a paper at BACUS 2007 successfully demonstrating the performance of SWaP for the characterization of defects as an alternative to traditional mask inspection [1]. It showed that this concept is not only feasible, but, in some cases, desirable. This paper expands on last year's work at AMTC to assess the full implementation of SWaP as an enhancement to mask characterization quality including defectivity, dimensional control, pattern fidelity, and in-plane distortion. We present a thorough analysis of both the technical and logistical challenges coupled with an objective view of the advantages and disadvantages from both the technical and financial perspectives. The analysis and model used by the AMTC will serve to provoke other mask shops to prepare their own analyses then consider this new paradigm for mask characterization and qualification.

Nanostructure Secondary-Mirror Apodizing Mask for Transmitter Signal Suppression in a Duplex Telescope

NASA Technical Reports Server (NTRS)

Hagopian, John; Livas, Jeffrey; Shiri, Shahram; Getty, Stephanie; Tveekrem, June; Butler, James

2012-01-01

A document discusses a nanostructure apodizing mask, made of multi-walled carbon nanotubes, that is applied to the centers (or in and around the holes) of the secondary mirrors of telescopes that are used to interferometrically measure the strain of space-time in response to gravitational waves. The shape of this ultra-black mask can be adjusted to provide a smooth transition to the clear aperture of the secondary mirror to minimize diffracted light. Carbon nanotubes grown on silicon are a viable telescope mirror substrate, and can absorb significantly more light than other black treatments. The hemispherical reflectance of multi-walled carbon nanotubes grown at GSFC is approximately 3 to 10 times better than a standard aerospace paint used for stray light control. At the LISA (Laser Interferometer Space Antenna) wavelength of 1 micron, the advantage over paint is a factor of 10. Primarily, in the center of the secondary mirror (in the region of central obscuration, where no received light is lost) a black mask is applied to absorb transmitted light that could be reflected back into the receiver. In the LISA telescope, this is in the center couple of millimeters. The shape of this absorber is critical to suppress diffraction at the edge. By using the correct shape, the stray light can be reduced by approximately 10 to the 9 orders of magnitude versus no center mask. The effect of the nanotubes has been simulated in a stray-light model. The effect of the apodizing mask has been simulated in a near-field diffraction model. Specifications are geometry-dependent, but the baseline design for the LISA telescope has been modeled as well. The coatings are somewhat fragile, but work is continuing to enhance adhesion.

Ultrasonic generator and detector using an optical mask having a grating for launching a plurality of spatially distributed, time varying strain pulses in a sample

DOEpatents

Maris, Humphrey J.

2003-01-01

A method and a system are disclosed for determining at least one characteristic of a sample that contains a substrate and at least one film disposed on or over a surface of the substrate. The method includes a first step of placing a mask over a free surface of the at least one film, where the mask has a top surface and a bottom surface that is placed adjacent to the free surface of the film. The bottom surface of the mask has formed therein or thereon a plurality of features for forming at least one grating. A next step directs optical pump pulses through the mask to the free surface of the film, where individual ones of the pump pulses are followed by at least one optical probe pulse. The pump pulses are spatially distributed by the grating for launching a plurality of spatially distributed, time varying strain pulses within the film, which cause a detectable change in optical constants of the film. A next step detects a reflected or a transmitted portion of the probe pulses, which are also spatially distributed by the grating. A next step measures a change in at least one characteristic of at least one of reflected or transmitted probe pulses due to the change in optical constants, and a further step determines the at least one characteristic of the sample from the measured change in the at least one characteristic of the probe pulses. An optical mask is also disclosed herein, and forms a part of these teachings.

Ultrasonic generator and detector using an optical mask having a grating for launching a plurality of spatially distributed, time varying strain pulses in a sample

DOEpatents

Maris, Humphrey J.

2002-01-01

A method and a system are disclosed for determining at least one characteristic of a sample that contains a substrate and at least one film disposed on or over a surface of the substrate. The method includes a first step of placing a mask over a free surface of the at least one film, where the mask has a top surface and a bottom surface that is placed adjacent to the free surface of the film. The bottom surface of the mask has formed therein or thereon a plurality of features for forming at least one grating. A next step directs optical pump pulses through the mask to the free surface of the film, where individual ones of the pump pulses are followed by at least one optical probe pulse. The pump pulses are spatially distributed by the grating for launching a plurality of spatially distributed, time varying strain pulses within the film, which cause a detectable change in optical constants of the film. A next step detects a reflected or a transmitted portion of the probe pulses, which are also spatially distributed by the grating. A next step measures a change in at least one characteristic of at least one of reflected or transmitted probe pulses due to the change in optical constants, and a further step determines the at least one characteristic of the sample from the measured change in the at least one characteristic of the probe pulses. An optical mask is also disclosed herein, and forms a part of these teachings.

WFIRST-AFTA coronagraph shaped pupil masks: design, fabrication, and characterization

NASA Astrophysics Data System (ADS)

Balasubramanian, Kunjithapatham; White, Victor; Yee, Karl; Echternach, Pierre; Muller, Richard; Dickie, Matthew; Cady, Eric; Prada, Camilo Mejia; Ryan, Daniel; Poberezhskiy, Ilya; Kern, Brian; Zhou, Hanying; Krist, John; Nemati, Bijan; Eldorado Riggs, A. J.; Zimmerman, Neil T.; Kasdin, N. Jeremy

2016-01-01

NASA WFIRST-AFTA mission study includes a coronagraph instrument to find and characterize exoplanets. Various types of masks could be employed to suppress the host starlight to about 10-9 level contrast over a broad spectrum to enable the coronagraph mission objectives. Such masks for high-contrast internal coronagraphic imaging require various fabrication technologies to meet a wide range of specifications, including precise shapes, micron scale island features, ultralow reflectivity regions, uniformity, wave front quality, and achromaticity. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks by combining electron beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each, highlighting milestone accomplishments from the High Contrast Imaging Testbed at JPL and from the High Contrast Imaging Lab at Princeton University.

Toward optimized light utilization in nanowire arrays using scalable nanosphere lithography and selected area growth.

PubMed

Madaria, Anuj R; Yao, Maoqing; Chi, Chunyung; Huang, Ningfeng; Lin, Chenxi; Li, Ruijuan; Povinelli, Michelle L; Dapkus, P Daniel; Zhou, Chongwu

2012-06-13

Vertically aligned, catalyst-free semiconducting nanowires hold great potential for photovoltaic applications, in which achieving scalable synthesis and optimized optical absorption simultaneously is critical. Here, we report combining nanosphere lithography (NSL) and selected area metal-organic chemical vapor deposition (SA-MOCVD) for the first time for scalable synthesis of vertically aligned gallium arsenide nanowire arrays, and surprisingly, we show that such nanowire arrays with patterning defects due to NSL can be as good as highly ordered nanowire arrays in terms of optical absorption and reflection. Wafer-scale patterning for nanowire synthesis was done using a polystyrene nanosphere template as a mask. Nanowires grown from substrates patterned by NSL show similar structural features to those patterned using electron beam lithography (EBL). Reflection of photons from the NSL-patterned nanowire array was used as a measure of the effect of defects present in the structure. Experimentally, we show that GaAs nanowires as short as 130 nm show reflection of <10% over the visible range of the solar spectrum. Our results indicate that a highly ordered nanowire structure is not necessary: despite the "defects" present in NSL-patterned nanowire arrays, their optical performance is similar to "defect-free" structures patterned by more costly, time-consuming EBL methods. Our scalable approach for synthesis of vertical semiconducting nanowires can have application in high-throughput and low-cost optoelectronic devices, including solar cells.

Projection optics box

DOEpatents

Hale, Layton C.; Malsbury, Terry; Hudyma, Russell M.; Parker, John M.

2000-01-01

A projection optics box or assembly for use in an optical assembly, such as in an extreme ultraviolet lithography (EUVL) system using 10-14 nm soft x-ray photons. The projection optics box utilizes a plurality of highly reflective optics or mirrors, each mounted on a precision actuator, and which reflects an optical image, such as from a mask, in the EUVL system onto a point of use, such as a target or silicon wafer, the mask, for example, receiving an optical signal from a source assembly, such as a developed from laser system, via a series of highly reflective mirrors of the EUVL system. The plurality of highly reflective optics or mirrors are mounted in a housing assembly comprised of a series of bulkheads having wall members secured together to form a unit construction of maximum rigidity. Due to the precision actuators, the mirrors must be positioned precisely and remotely in tip, tilt, and piston (three degrees of freedom), while also providing exact constraint.

Spectral bidirectional reflectance distribution function measurements on well-defined textured surfaces: direct observation of shadowing, masking, inter-reflection, and transparency effects.

PubMed

Wilen, Larry; Dasgupta, Bivash R

2011-11-01

We present results for the bidirectional reflectance distribution function (BRDF) for samples of uniform rectangular and triangular grooves constructed from polydimethylsilicone replicas. The measurements are performed with the detector in the plane of incidence, but with varying groove orientations with respect to that plane. The samples are opaque in some cases and semitransparent in others. By measuring the BRDF for colored samples over a wide spectral range, we explicitly probe the effect of sample albedo, which is important for inter-reflections. For the opaque samples, we compare the results with exact theoretical results either taken from the literature (for the triangular geometry) or worked out here (for the rectangular geometry). For both geometries, we also extend the theoretical results to finite length grooves. There is generally very good agreement between theory and the experiment. Shadowing, masking, and inter-reflection are clearly observed, as well as effects that may be due to polarization and asperity scattering. For semitransparent samples, we observe the effect of increasing transparency on the BRDF.

Scanner qualification with IntenCD based reticle error correction

NASA Astrophysics Data System (ADS)

Elblinger, Yair; Finders, Jo; Demarteau, Marcel; Wismans, Onno; Minnaert Janssen, Ingrid; Duray, Frank; Ben Yishai, Michael; Mangan, Shmoolik; Cohen, Yaron; Parizat, Ziv; Attal, Shay; Polonsky, Netanel; Englard, Ilan

2010-03-01

Scanner introduction into the fab production environment is a challenging task. An efficient evaluation of scanner performance matrices during factory acceptance test (FAT) and later on during site acceptance test (SAT) is crucial for minimizing the cycle time for pre and post production-start activities. If done effectively, the matrices of base line performance established during the SAT are used as a reference for scanner performance and fleet matching monitoring and maintenance in the fab environment. Key elements which can influence the cycle time of the SAT, FAT and maintenance cycles are the imaging, process and mask characterizations involved with those cycles. Discrete mask measurement techniques are currently in use to create across-mask CDU maps. By subtracting these maps from their final wafer measurement CDU map counterparts, it is possible to assess the real scanner induced printed errors within certain limitations. The current discrete measurement methods are time consuming and some techniques also overlook mask based effects other than line width variations, such as transmission and phase variations, all of which influence the final printed CD variability. Applied Materials Aera2TM mask inspection tool with IntenCDTM technology can scan the mask at high speed, offer full mask coverage and accurate assessment of all masks induced source of errors simultaneously, making it beneficial for scanner qualifications and performance monitoring. In this paper we report on a study that was done to improve a scanner introduction and qualification process using the IntenCD application to map the mask induced CD non uniformity. We will present the results of six scanners in production and discuss the benefits of the new method.

Exoplanet Coronagraph Shaped Pupil Masks and Laboratory Scale Star Shade Masks: Design, Fabrication and Characterization

NASA Technical Reports Server (NTRS)

Balasubramanian, Kunjithapatha; White, Victor; Yee, Karl; Echternach, Pierre; Muller, Richard; Dickie, Matthew; Cady, Eric; Mejia Prada, Camilo; Ryan, Daniel; Poberezhskiy, Ilya;

Exoplanet coronagraph shaped pupil masks and laboratory scale star shade masks: design, fabrication and characterization

NASA Astrophysics Data System (ADS)

Balasubramanian, Kunjithapatham; White, Victor; Yee, Karl; Echternach, Pierre; Muller, Richard; Dickie, Matthew; Cady, Eric; Mejia Prada, Camilo; Ryan, Daniel; Poberezhskiy, Ilya; Zhou, Hanying; Kern, Brian; Riggs, A. J.; Zimmerman, Neil T.; Sirbu, Dan; Shaklan, Stuart; Kasdin, Jeremy

2015-09-01

Star light suppression technologies to find and characterize faint exoplanets include internal coronagraph instruments as well as external star shade occulters. Currently, the NASA WFIRST-AFTA mission study includes an internal coronagraph instrument to find and characterize exoplanets. Various types of masks could be employed to suppress the host star light to about 10-9 level contrast over a broad spectrum to enable the coronagraph mission objectives. Such masks for high contrast internal coronagraphic imaging require various fabrication technologies to meet a wide range of specifications, including precise shapes, micron scale island features, ultra-low reflectivity regions, uniformity, wave front quality, achromaticity, etc. We present the approaches employed at JPL to produce pupil plane and image plane coronagraph masks by combining electron beam, deep reactive ion etching, and black silicon technologies with illustrative examples of each, highlighting milestone accomplishments from the High Contrast Imaging Testbed (HCIT) at JPL and from the High Contrast Imaging Lab (HCIL) at Princeton University. We also present briefly the technologies applied to fabricate laboratory scale star shade masks.

Direct Mask Overlay Inspection

NASA Astrophysics Data System (ADS)

Hsia, Liang-Choo; Su, Lo-Soun

1983-11-01

In this paper, we present a mask inspection methodology and procedure that involves direct X-Y measurements. A group of dice is selected for overlay measurement; four measurement targets were laid out in the kerf of each die. The measured coordinates are then fit-ted to either a "historical" grid, which reflects the individual tool bias, or to an ideal grid squares fashion. Measurements are done using a Nikon X-Y laser interferometric measurement system, which provides a reference grid. The stability of the measurement system is essential. We then apply appropriate statistics to the residual after the fit to determine the overlay performance. Statistical methods play an important role in the product disposition. The acceptance criterion is, however, a compromise between the cost for mask making and the final device yield. In order to satisfy the demand on mask houses for quality of masks and high volume, mixing lithographic tools in mask making has become more popular, in particular, mixing optical and E-beam tools. In this paper, we also discuss the inspection procedure for mixing different lithographic tools.

[Effect of oxygen tubing connection site on percutaneous oxygen partial pressure and percutaneous carbon dioxide partial pressure in patients with chronic obstructive pulmonary disease during noninvasive positive pressure ventilation].

PubMed

Mi, S; Zhang, L M

2017-04-12

Objective: We evaluated the effects of administering oxygen through nasal catheters inside the mask or through the mask on percutaneous oxygen partial pressure (PcO(2))and percutaneous carbon dioxide partial pressure (PcCO(2)) during noninvasive positive pressure ventilation (NPPV) to find a better way of administering oxygen, which could increase PcO(2) by increasing the inspired oxygen concentration. Methods: Ten healthy volunteers and 9 patients with chronic obstructive pulmonary disease complicated by type Ⅱ respiratory failure were included in this study. Oxygen was administered through a nasal catheter inside the mask or through the mask (oxygen flow was 3 and 5 L/min) during NPPV. PcO(2) and PcCO(2) were measured to evaluate the effects of administering oxygen through a nasal catheter inside the mask or through the mask, indirectly reflecting the effects of administering oxygen through nasal catheter inside the mask or through the mask on inspired oxygen concentration. Results: Compared to administering oxygen through the mask during NPPV, elevated PcO(2) was measured in administering oxygen through the nasal catheter inside the mask, and the differences were statistically significant ( P <0.05). At the same time, there was no significant change in PcCO(2) ( P >0.05). Conclusion: Administering oxygen through a nasal catheter inside the mask during NPPV increased PcO(2) by increasing the inspired oxygen concentration but did not increase PcCO(2). This method of administering oxygen could conserve oxygen and be suitable for family NPPV. Our results also provided theoretical basis for the development of new masks.

Quantitative evaluation of manufacturability and performance for ILT produced mask shapes using a single-objective function

NASA Astrophysics Data System (ADS)

Choi, Heon; Wang, Wei-long; Kallingal, Chidam

2015-03-01

The continuous scaling of semiconductor devices is quickly outpacing the resolution improvements of lithographic exposure tools and processes. This one-sided progression has pushed optical lithography to its limits, resulting in the use of well-known techniques such as Sub-Resolution Assist Features (SRAF's), Source-Mask Optimization (SMO), and double-patterning, to name a few. These techniques, belonging to a larger category of Resolution Enhancement Techniques (RET), have extended the resolution capabilities of optical lithography at the cost of increasing mask complexity, and therefore cost. One such technique, called Inverse Lithography Technique (ILT), has attracted much attention for its ability to produce the best possible theoretical mask design. ILT treats the mask design process as an inverse problem, where the known transformation from mask to wafer is carried out backwards using a rigorous mathematical approach. One practical problem in the application of ILT is the resulting contour-like mask shapes that must be "Manhattanized" (composed of straight edges and 90-deg corners) in order to produce a manufacturable mask. This conversion process inherently degrades the mask quality as it is a departure from the "optimal mask" represented by the continuously curved shapes produced by ILT. However, simpler masks composed of longer straight edges reduce the mask cost as it lowers the shot count and saves mask writing time during mask fabrication, resulting in a conflict between manufacturability and performance for ILT produced masks1,2. In this study, various commonly used metrics will be combined into an objective function to produce a single number to quantitatively measure a particular ILT solution's ability to balance mask manufacturability and RET performance. Several metrics that relate to mask manufacturing costs (i.e. mask vertex count, ILT computation runtime) are appropriately weighted against metrics that represent RET capability (i.e. process-variation band, edge-placement-error) in order to reflect the desired practical balance. This well-defined scoring system allows direct comparison of several masks with varying degrees of complexities. Using this method, ILT masks produced with increasing mask constraints will be compared, and it will be demonstrated that using the smallest minimum width for mask shapes does not always produce the optimal solution.

Cross-orientation suppression in human visual cortex

PubMed Central

Heeger, David J.

2011-01-01

Cross-orientation suppression was measured in human primary visual cortex (V1) to test the normalization model. Subjects viewed vertical target gratings (of varying contrasts) with or without a superimposed horizontal mask grating (fixed contrast). We used functional magnetic resonance imaging (fMRI) to measure the activity in each of several hypothetical channels (corresponding to subpopulations of neurons) with different orientation tunings and fit these orientation-selective responses with the normalization model. For the V1 channel maximally tuned to the target orientation, responses increased with target contrast but were suppressed when the horizontal mask was added, evident as a shift in the contrast gain of this channel's responses. For the channel maximally tuned to the mask orientation, a constant baseline response was evoked for all target contrasts when the mask was absent; responses decreased with increasing target contrast when the mask was present. The normalization model provided a good fit to the contrast-response functions with and without the mask. In a control experiment, the target and mask presentations were temporally interleaved, and we found no shift in contrast gain, i.e., no evidence for suppression. We conclude that the normalization model can explain cross-orientation suppression in human visual cortex. The approach adopted here can be applied broadly to infer, simultaneously, the responses of several subpopulations of neurons in the human brain that span particular stimulus or feature spaces, and characterize their interactions. In addition, it allows us to investigate how stimuli are represented by the inferred activity of entire neural populations. PMID:21775720

Less is More: Neural Activity During Very Brief and Clearly Visible Exposure to Phobic Stimuli

PubMed Central

Siegel, Paul; Warren, Richard; Wang, Zhishun; Yang, Jie; Cohen, Don; Anderson, Jason F.; Murray, Lilly; Peterson, Bradley S.

2017-01-01

Research on automatic processes in emotion has focused almost exclusively on the provocation of fear responses. We have shown, in contrast, that the repeated presentation of masked feared images reduces avoidance of a live tarantula by spider-phobic participants. We investigated the neural basis for these adaptive effects of masked exposure. We identified 21 spider-phobic and 21 control participants using a psychiatric interview, fear questionnaire, and approach behavior towards a live tarantula. They received each of three conditions: (1) very brief exposure (VBE) to masked images of spiders; (2) clearly visible exposure (CVE) to spiders; and (3) masked images of flowers (control). Only VBE to masked spiders generated neural activity more strongly in phobic than in control participants, within subcortical fear, attention, higher-order language, and vision systems. Counter-intuitively, CVE to the same spiders generated stronger neural activity in control rather than phobic participants within these and other systems. VBE activated regions that support fear processing in phobic participants without causing them to experience fear consciously. CVE, by contrast, deactivated regions supporting fear regulation and caused phobic participants to experience fear. Activations by CVE to spiders correlated with fear ratings - explicit fear. Activations by VBE to masked spiders correlated with color-naming interference of spider words – implicit fear. These multiple dissociations between the effects of VBE and CVE to spiders suggest that limiting awareness of exposure to phobic stimuli through visual masking paradoxically facilitates their processing, while simultaneously minimizing the experience of fear. PMID:28165171

KAZRCORMD

DOE Data Explorer

Johnson, Karen; Toto, Tami; Jensen, Michael

2011-05-03

For the Ka ARM Zenith Radar (KAZR) data stream, kazrmd.b1 (md=moderate sensitivity), produces significant detection mask, corrects reflectivity for gaseous attenuation, and dealiases mean Doppler velocity.

KAZRCORHI

DOE Data Explorer

Johnson, Karen; Toto, Tami; Jensen, Michael

2011-01-18

For the Ka ARM Zenith Radar (KAZR) data stream, kazrhi.b1 (hi=high sensitivity), produces significant detection mask, corrects reflectivity for gaseous attenuation, and dealiases mean Doppler velocity.

KAZRCORGE

DOE Data Explorer

Johnson, Karen; Toto, Tami; Jensen, Michael

2011-01-18

For the Ka ARM Zenith Radar (KAZR) data stream, kazrge.b1 (ge=general sensitivity), produces significant detection mask, corrects reflectivity for gaseous attenuation, and dealiases mean Doppler velocity.

Active-duty military service members’ visual representations of PTSD and TBI in masks

PubMed Central

Walker, Melissa S.; Kaimal, Girija; Gonzaga, Adele M. L.; Myers-Coffman, Katherine A.; DeGraba, Thomas J.

2017-01-01

ABSTRACT Active-duty military service members have a significant risk of sustaining physical and psychological trauma resulting in traumatic brain injury (TBI) and post-traumatic stress disorder (PTSD). Within an interdisciplinary treatment approach at the National Intrepid Center of Excellence, service members participated in mask making during art therapy sessions. This study presents an analysis of the mask-making experiences of service members (n = 370) with persistent symptoms from combat- and mission-related TBI, PTSD, and other concurrent mood issues. Data sources included mask images and therapist notes collected over a five-year period. The data were coded and analyzed using grounded theory methods. Findings indicated that mask making offered visual representations of the self related to individual personhood, relationships, community, and society. Imagery themes referenced the injury, relational supports/losses, identity transitions/questions, cultural metaphors, existential reflections, and conflicted sense of self. These visual insights provided an increased understanding of the experiences of service members, facilitating their recovery. PMID:28452610

Measuring and Modeling the Growth Dynamics of Self-Catalyzed GaP Nanowire Arrays.

PubMed

Oehler, Fabrice; Cattoni, Andrea; Scaccabarozzi, Andrea; Patriarche, Gilles; Glas, Frank; Harmand, Jean-Christophe

2018-02-14

The bottom-up fabrication of regular nanowire (NW) arrays on a masked substrate is technologically relevant, but the growth dynamic is rather complex due to the superposition of severe shadowing effects that vary with array pitch, NW diameter, NW height, and growth duration. By inserting GaAsP marker layers at a regular time interval during the growth of a self-catalyzed GaP NW array, we are able to retrieve precisely the time evolution of the diameter and height of a single NW. We then propose a simple numerical scheme which fully computes shadowing effects at play in infinite arrays of NWs. By confronting the simulated and experimental results, we infer that re-emission of Ga from the mask is necessary to sustain the NW growth while Ga migration on the mask must be negligible. When compared to random cosine or random uniform re-emission from the mask, the simple case of specular reflection on the mask gives the most accurate account of the Ga balance during the growth.

Active-duty military service members' visual representations of PTSD and TBI in masks.

PubMed

Walker, Melissa S; Kaimal, Girija; Gonzaga, Adele M L; Myers-Coffman, Katherine A; DeGraba, Thomas J

2017-12-01

Active-duty military service members have a significant risk of sustaining physical and psychological trauma resulting in traumatic brain injury (TBI) and post-traumatic stress disorder (PTSD). Within an interdisciplinary treatment approach at the National Intrepid Center of Excellence, service members participated in mask making during art therapy sessions. This study presents an analysis of the mask-making experiences of service members (n = 370) with persistent symptoms from combat- and mission-related TBI, PTSD, and other concurrent mood issues. Data sources included mask images and therapist notes collected over a five-year period. The data were coded and analyzed using grounded theory methods. Findings indicated that mask making offered visual representations of the self related to individual personhood, relationships, community, and society. Imagery themes referenced the injury, relational supports/losses, identity transitions/questions, cultural metaphors, existential reflections, and conflicted sense of self. These visual insights provided an increased understanding of the experiences of service members, facilitating their recovery.

Development of new maskless manufacturing method for anti-reflection structure and application to large-area lens with curved surface

NASA Astrophysics Data System (ADS)

Yamamoto, Kazuya; Takaoka, Toshimitsu; Fukui, Hidetoshi; Haruta, Yasuyuki; Yamashita, Tomoya; Kitagawa, Seiichiro

2016-03-01

In general, thin-film coating process is widely applied on optical lens surface as anti-reflection function. In normal production process, at first lens is manufactured by molding, then anti-reflection is added by thin-film coating. In recent years, instead of thin-film coating, sub-wavelength structures adding on surface of molding die are widely studied and development to keep anti-reflection performance. As merits, applying sub-wavelength structure, coating process becomes unnecessary and it is possible to reduce man-hour costs. In addition to cost merit, these are some technical advantages on this study. Adhesion of coating depends on material of plastic, and it is impossible to apply anti-reflection function on arbitrary surface. Sub-wavelength structure can solve both problems. Manufacturing method of anti-reflection structure can be divided into two types mainly. One method is with the resist patterning, and the other is mask-less method that does not require patterning. What we have developed is new mask-less method which is no need for resist patterning and possible to impart an anti-reflection structure to large area and curved lens surface, and can be expected to apply to various market segments. We report developed technique and characteristics of production lens.

Suppression of side lobes in a spectrum of fibre Bragg gratings due to the transverse displacement of phase mask with respect to the optical fibre

DOE Office of Scientific and Technical Information (OSTI.GOV)

Abdullina, S R; Nemov, I N; Babin, Sergei A

2012-09-30

The possibility of apodisation of fibre Bragg gratings (FBGs) recorded in the interference region of two Gaussian beams in the phase-mask scheme is considered. The FBG reflection spectra are numerically simulated for different values of recordingbeam parameters and the distance between the axes of interfering beams diffracted into different orders, which is varied by transverse displacement of the phase mask with respect to the optical fibre. Suppression of side lobes and smoothing out of the FBG spectrum with an increase in the transverse displacement of the phase mask is experimentally demonstrated. It is shown that this effect is caused bymore » the equalisation of the mean induced refractive index in the FBG region. (optical fibres, lasers and amplifiers. properties and applications)« less

Ion beam deposition system for depositing low defect density extreme ultraviolet mask blanks

NASA Astrophysics Data System (ADS)

Jindal, V.; Kearney, P.; Sohn, J.; Harris-Jones, J.; John, A.; Godwin, M.; Antohe, A.; Teki, R.; Ma, A.; Goodwin, F.; Weaver, A.; Teora, P.

2012-03-01

Extreme ultraviolet lithography (EUVL) is the leading next-generation lithography (NGL) technology to succeed optical lithography at the 22 nm node and beyond. EUVL requires a low defect density reflective mask blank, which is considered to be one of the top two critical technology gaps for commercialization of the technology. At the SEMATECH Mask Blank Development Center (MBDC), research on defect reduction in EUV mask blanks is being pursued using the Veeco Nexus deposition tool. The defect performance of this tool is one of the factors limiting the availability of defect-free EUVL mask blanks. SEMATECH identified the key components in the ion beam deposition system that is currently impeding the reduction of defect density and the yield of EUV mask blanks. SEMATECH's current research is focused on in-house tool components to reduce their contributions to mask blank defects. SEMATECH is also working closely with the supplier to incorporate this learning into a next-generation deposition tool. This paper will describe requirements for the next-generation tool that are essential to realize low defect density EUV mask blanks. The goal of our work is to enable model-based predictions of defect performance and defect improvement for targeted process improvement and component learning to feed into the new deposition tool design. This paper will also highlight the defect reduction resulting from process improvements and the restrictions inherent in the current tool geometry and components that are an impediment to meeting HVM quality EUV mask blanks will be outlined.

Stress engineering in GaN structures grown on Si(111) substrates by SiN masking layer application

DOE Office of Scientific and Technical Information (OSTI.GOV)

Szymański, Tomasz, E-mail: tomasz.szymanski@pwr.edu.pl; Wośko, Mateusz; Paszkiewicz, Bogdan

2015-07-15

GaN layers without and with an in-situ SiN mask were grown by using metal organic vapor phase epitaxy for three different approaches used in GaN on silicon(111) growth, and the physical and optical properties of the GaN layers were studied. For each approach applied, GaN layers of 1.4 μm total thickness were grown, using silan SiH{sub 4} as Si source in order to grow Si{sub x}N{sub x} masking layer. The optical micrographs, scanning electron microscope images, and atomic force microscope images of the grown samples revealed cracks for samples without SiN mask, and micropits, which were characteristic for the samples grownmore » with SiN mask. In situ reflectance signal traces were studied showing a decrease of layer coalescence time and higher degree of 3D growth mode for samples with SiN masking layer. Stress measurements were conducted by two methods—by recording micro-Raman spectra and ex-situ curvature radius measurement—additionally PLs spectra were obtained revealing blueshift of PL peak positions with increasing stress. The authors have shown that a SiN mask significantly improves physical and optical properties of GaN multilayer systems reducing stress in comparison to samples grown applying the same approaches but without SiN masking layer.« less

Vector scattering analysis of TPF coronagraph pupil masks

NASA Astrophysics Data System (ADS)

Ceperley, Daniel P.; Neureuther, Andrew R.; Lieber, Michael D.; Kasdin, N. Jeremy; Shih, Ta-Ming

2004-10-01

Rigorous finite-difference time-domain electromagnetic simulation is used to simulate the scattering from proto-typical pupil mask cross-section geometries and to quantify the differences from the normally assumed ideal on-off behavior. Shaped pupil plane masks are a promising technology for the TPF coronagraph mission. However the stringent requirements placed on the optics require that the detailed behavior of the edge-effects of these masks be examined carefully. End-to-end optical system simulation is essential and an important aspect is the polarization and cross-section dependent edge-effects which are the subject of this paper. Pupil plane masks are similar in many respects to photomasks used in the integrated circuit industry. Simulation capabilities such as the FDTD simulator, TEMPEST, developed for analyzing polarization and intensity imbalance effects in nonplanar phase-shifting photomasks, offer a leg-up in analyzing coronagraph masks. However, the accuracy in magnitude and phase required for modeling a chronograph system is extremely demanding and previously inconsequential errors may be of the same order of magnitude as the physical phenomena under study. In this paper, effects of thick masks, finite conductivity metals, and various cross-section geometries on the transmission of pupil-plane masks are illustrated. Undercutting the edge shape of Cr masks improves the effective opening width to within λ/5 of the actual opening but TE and TM polarizations require opposite compensations. The deviation from ideal is examined at the reference plane of the mask opening. Numerical errors in TEMPEST, such as numerical dispersion, perfectly matched layer reflections, and source haze are also discussed along with techniques for mitigating their impacts.

Remote Sensing of Radiative and Microphysical Properties of Clouds During TC (sup 4): Results from MAS, MASTER, MODIS, and MISR

NASA Technical Reports Server (NTRS)

King, Michael D.; Platnick, Steven; Wind, Galina; Arnold, G. Thomas; Dominguez, Roseanne T.

2010-01-01

The Moderate Resolution Imaging Spectroradiometer (MODIS) Airborne Simulator (MAS) and MODIS/Advanced Spaceborne Thermal Emission and Reflection Radiometer (ASTER) Airborne Simulator (MASTER) were used to obtain measurements of the bidirectional reflectance and brightness temperature of clouds at 50 discrete wavelengths between 0.47 and 14.2 microns (12.9 microns for MASTER). These observations were obtained from the NASA ER-2 aircraft as part of the Tropical Composition, Cloud and Climate Coupling (TC4) experiment conducted over Central America and surrounding Pacific and Atlantic Oceans between 17 July and 8 August 2007. Multispectral images in eleven distinct bands were used to derive a confidence in clear sky (or alternatively the probability Of cloud) over land and ocean ecosystems. Based on the results of individual tests run as part of the cloud mask, an algorithm was developed to estimate the phase of the clouds (liquid water, ice, or undetermined phase). The cloud optical thickness and effective radius were derived for both liquid water and ice clouds that were detected during each flight, using a nearly identical algorithm to that implemented operationally to process MODIS Cloud data from the Aqua and Terra satellites (Collection 5). This analysis shows that the cloud mask developed for operational use on MODIS, and tested using MAS and MASTER data in TC(sup 4), is quite capable of distinguishing both liquid water and ice clouds during daytime conditions over both land and ocean. The cloud optical thickness and effective radius retrievals use five distinct bands of the MAS (or MASTER), and these results were compared with nearly simultaneous retrievals of marine liquid water clouds from MODIS on the Terra spacecraft. Finally, this MODIS-based algorithm was adapted to Multiangle Imaging SpectroRadiometer (MISR) data to infer the cloud optical thickness Of liquid water clouds from MISR. Results of this analysis are compared and contrasted.

65-nm full-chip implementation using double dipole lithography

NASA Astrophysics Data System (ADS)

Hsu, Stephen D.; Chen, J. Fung; Cororan, Noel; Knose, William T.; Van Den Broeke, Douglas J.; Laidig, Thomas L.; Wampler, Kurt E.; Shi, Xuelong; Hsu, Michael; Eurlings, Mark; Finders, Jo; Chiou, Tsann-Bim; Socha, Robert J.; Conley, Will; Hsieh, Yen W.; Tuan, Steve; Hsieh, Frank

2003-06-01

Double Dipole Lithography (DDL) has been demonstrated to be capable of patterning complex 2D patterns. Due to inherently high aerial imaging contrast, especially for dense features, we have found that it has a very good potential to meet manufacturing requirements for the 65nm node using ArF binary chrome masks. For patterning in the k1<0.35 regime without resorting to hard phase-shift masks (PSMs), DDL is one unique Resolution Enhancement Technique (RET) which can achieve an acceptable process window. To utilize DDL for printing actual IC devices, the original design data must be decomposed into "vertical (V)" and "horizontal (H)" masks for the respective X- and Y-dipole exposures. An improved two-pass, model-based, DDL mask data processing methodology has been established. It is capable of simultaneously converting complex logic and memory mask patterns into DDL compatible mask layout. To maximize the overlapped process window area, we have previously shown that the pattern-shielding algorithm must be intelligently applied together with both Scattering Bars (SBs) and model-based OPC (MOPC). Due to double exposures, stray light must be well-controlled to ensure uniform printing across the entire chip. One solution to minimize stray light is to apply large patches of solid chrome in open areas to reduce the background transmission during exposure. Unfortunately, this is not feasible for a typical clear-field poly gate masks to be patterned by a positive resist process. In this work, we report a production-worthy DDL mask pattern decomposition scheme for full-chip application. A new generation of DDL technology reticle set has been developed to verify the printing performance. Shielding is a critical part of the DDL. An innovative shielding scheme has been developed to protect the critical features and minimize the impact of stray light during double exposure.

Performance evaluation of three on-site adulterant detection devices for urine specimens.

PubMed

Peace, Michelle R; Tarnai, Lisa D

2002-10-01

The performance of three on-site adulterant detection devices that assess the integrity of urine specimens collected for drug-of-abuse testing was evaluated: the Intect 7, MASK Ultra Screen, and Adultacheck 4. Intect 7 simultaneously tests creatinine, nitrite, glutaraldehyde, pH, specific gravity, and the presence of bleach and pyridinium chlorochromate (PCC). Mask Ultra Screen tests creatinine, nitrite, pH, specific gravity, and oxidants, and Adultacheck 4 tests creatinine, nitrite, glutaraldehyde, and pH. Urine specimens were prepared with the Substance Abuse and Mental Health Administration regulated analytes at 50% above the cut-off concentrations. Stealth, Urine Luck, Instant Clean ADD-IT-ive, and KLEAR were added individually to the drug-added urine specimens so that their concentrations reflected the "optimum" usage reported in their package inserts and 25% above and below that optimum. Stealth is reported to be peroxidase; Urine Luck is believed to be PCC; Instant Clean ADD-it-ive reportedly contains glutaraldehyde, and Klear is a nitrite. The following diluents/adulterants were added at 25%, 33%, and 50% of the volume of drug-added urine: distilled water, bleach, ammonia, and vinegar. Of the devices tested, Intect 7 proved to be the most sensitive, and it correctly indicated the presence of adulterant or diluent in all samples tested. In order to do so, all indication pads had to be assessed in concert. Adultacheck 4 specifically assesses four characteristics of urine integrity and is therefore very limited in detecting the use of several popular adulterants that are commercially available. Although it correctly assessed the four characteristics, it did not detect the use of Stealth, Urine Luck, or Instant Clean ADD-it-ive. Mask Ultra Screen can potentially detect a broader range of adulterants than Adultacheck 4. However, in practice, it only detected them at levels well above their optimum usage, making it less efficacious than Intect 7. Clearly, the specific identification of an adulterant is a trade-off for sensitive detection of several adulterants.

Masked priming effect reflects evidence accumulated by the prime.

PubMed

Kinoshita, Sachiko; Norris, Dennis

2010-01-01

In the same-different match task, masked priming is observed with the same responses but not different responses. Norris and Kinoshita's (2008) Bayesian reader account of masked priming explains this pattern based on the same principle as that explaining the absence of priming for nonwords in the lexical decision task. The pattern of priming follows from the way the model makes optimal decisions in the two tasks; priming does not depend on first activating the prime and then the target. An alternative explanation is in terms of a bias towards responding "same" that exactly counters the facilitatory effect of lexical access. The present study tested these two views by varying both the degree to which the prime predicts the response and the visibility of the prime. Unmasked primes produced effects expected from the view that priming is influenced by the degree to which the prime predicts the response. In contrast, with masked primes, the size of priming for the same response was completely unaffected by predictability. These results rule out response bias as an explanation of the absence of masked priming for different responses and, in turn, indicate that masked priming is not a consequence of automatic lexical access of the prime.

Batman flies: a compact spectro-imager for space observation

NASA Astrophysics Data System (ADS)

Zamkotsian, Frederic; Ilbert, Olivier; Zoubian, Julien; Delsanti, Audrey; Boissier, Samuel; Lancon, Ariane

2017-11-01

Multi-object spectroscopy (MOS) is a key technique for large field of view surveys. MOEMS programmable slit masks could be next-generation devices for selecting objects in future infrared astronomical instrumentation for space telescopes. MOS is used extensively to investigate astronomical objects by optimizing the Signal-to-Noise Ratio (SNR): high precision spectra are obtained and the problem of spectral confusion and background level occurring in slitless spectroscopy is cancelled. Fainter limiting fluxes are reached and the scientific return is maximized both in cosmology and in legacy science. Major telescopes around the world are equipped with MOS in order to simultaneously record several hundred spectra in a single observation run. Next generation MOS for space like the Near Infrared Multi-Object Spectrograph (NIRSpec) for the James Webb Space Telescope (JWST) require a programmable multi-slit mask. Conventional masks or complex fiber-optics-based mechanisms are not attractive for space. The programmable multi-slit mask requires remote control of the multislit configuration in real time. During the early-phase studies of the European Space Agency (ESA) EUCLID mission, a MOS instrument based on a MOEMS device has been assessed. Due to complexity and cost reasons, slitless spectroscopy was chosen for EUCLID, despite a much higher efficiency with slit spectroscopy. A promising possible solution is the use of MOEMS devices such as micromirror arrays (MMA) [1,2,3] or micro-shutter arrays (MSA) [4]. MMAs are designed for generating reflecting slits, while MSAs generate transmissive slits. In Europe an effort is currently under way to develop single-crystalline silicon micromirror arrays for future generation infrared multi-object spectroscopy (collaboration LAM / EPFL-CSEM) [5,6]. By placing the programmable slit mask in the focal plane of the telescope, the light from selected objects is directed toward the spectrograph, while the light from other objects and from the sky background is blocked. To get more than 2 millions independent micromirrors, the only available component is a Digital Micromirror Device (DMD) chip from Texas Instruments (TI) that features 2048 x 1080 mirrors and a 13.68μm pixel pitch. DMDs have been tested in space environment (-40°C, vacuum, radiations) by LAM and no showstopper has been revealed [7]. We are presenting in this paper a DMD-based spectrograph called BATMAN, including two arms, one spectroscopic channel and one imaging channel. This instrument is designed for getting breakthrough results in several science cases, from high-z galaxies to nearby galaxies and Trans-Neptunian Objects of Kuiper Belt.

Optical images of visible and invisible percepts in the primary visual cortex of primates

PubMed Central

Macknik, Stephen L.; Haglund, Michael M.

1999-01-01

We optically imaged a visual masking illusion in primary visual cortex (area V-1) of rhesus monkeys to ask whether activity in the early visual system more closely reflects the physical stimulus or the generated percept. Visual illusions can be a powerful way to address this question because they have the benefit of dissociating the stimulus from perception. We used an illusion in which a flickering target (a bar oriented in visual space) is rendered invisible by two counter-phase flickering bars, called masks, which flank and abut the target. The target and masks, when shown separately, each generated correlated activity on the surface of the cortex. During the illusory condition, however, optical signals generated in the cortex by the target disappeared although the image of the masks persisted. The optical image thus was correlated with perception but not with the physical stimulus. PMID:10611363

Fabrication of Fiber-Optic Tilted Bragg Grating Filter in 40 nm Range with A Single Phase Mask

NASA Technical Reports Server (NTRS)

Grant, Joseph; Wang, Y.; Sharma, A.; Burdine, Robert V. (Technical Monitor)

2002-01-01

Fiber-optic Bragg grating filters are fabricated with a range of Bragg wavelength between 1296 and 1336 nm, using a single phase mask. 30 mW of continuous-wave light at 244 nm is used from a frequency-doubled argon-ion laser having an intracavity etalon. Gratings are fabricated by tilting the photosensitive fiber with respect to the phase mask up to an angle of 15 degrees. The variation of Bragg wavelength with the fiber-tilt is explained with a simple formula. High spatial coherence of 244 nm light makes it possible to displace the fiber as much as 6 mm in front of the phase mask and tilt the fiber by as much as 15 degrees. This results in nearly constant band-width and near 100% reflectively for all gratings throughout the 40 nm range.

A hardware architecture for real-time shadow removal in high-contrast video

NASA Astrophysics Data System (ADS)

Verdugo, Pablo; Pezoa, Jorge E.; Figueroa, Miguel

2017-09-01

Broadcasting an outdoor sports event at daytime is a challenging task due to the high contrast that exists between areas in the shadow and light conditions within the same scene. Commercial cameras typically do not handle the high dynamic range of such scenes in a proper manner, resulting in broadcast streams with very little shadow detail. We propose a hardware architecture for real-time shadow removal in high-resolution video, which reduces the shadow effect and simultaneously improves shadow details. The algorithm operates only on the shadow portions of each video frame, thus improving the results and producing more realistic images than algorithms that operate on the entire frame, such as simplified Retinex and histogram shifting. The architecture receives an input in the RGB color space, transforms it into the YIQ space, and uses color information from both spaces to produce a mask of the shadow areas present in the image. The mask is then filtered using a connected components algorithm to eliminate false positives and negatives. The hardware uses pixel information at the edges of the mask to estimate the illumination ratio between light and shadow in the image, which is then used to correct the shadow area. Our prototype implementation simultaneously processes up to 7 video streams of 1920×1080 pixels at 60 frames per second on a Xilinx Kintex-7 XC7K325T FPGA.

XBAER-derived aerosol optical thickness from OLCI/Sentinel-3 observation

NASA Astrophysics Data System (ADS)

Mei, Linlu; Rozanov, Vladimir; Vountas, Marco; Burrows, John P.; Richter, Andreas

2018-02-01

A cloud identification algorithm used for cloud masking, which is based on the spatial variability of reflectances at the top of the atmosphere in visible wavelengths, has been developed for the retrieval of aerosol properties by MODIS. It is shown that the spatial pattern of cloud reflectance, as observed from space, is very different from that of aerosols. Clouds show a high spatial variability in the scale of a hundred metres to a few kilometres, whereas aerosols in general are homogeneous. The concept of spatial variability of reflectances at the top of the atmosphere is mainly applicable over the ocean, where the surface background is sufficiently homogeneous for the separation between aerosols and clouds. Aerosol retrievals require a sufficiently accurate cloud identification to be able to mask these ground scenes. However, a conservative mask will exclude strong aerosol episodes and a less conservative mask could introduce cloud contamination that biases the retrieved aerosol optical properties (e.g. aerosol optical depth and effective radii). A detailed study on the effect of cloud contamination on aerosol retrievals has been performed and parameters are established determining the threshold value for the MODIS aerosol cloud mask (3×3-STD) over the ocean. The 3×3-STD algorithm discussed in this paper is the operational cloud mask used for MODIS aerosol retrievals over the ocean.A prolonged pollution haze event occurred in the northeast part of China during the period 16-21 December 2016. To assess the impact of such events, the amounts and distribution of aerosol particles, formed in such events, need to be quantified. The newly launched Ocean Land Colour Instrument (OLCI) onboard Sentinel-3 is the successor of the MEdium Resolution Imaging Spectrometer (MERIS). It provides measurements of the radiance and reflectance at the top of the atmosphere, which can be used to retrieve the aerosol optical thickness (AOT) from synoptic to global scales. In this study, the recently developed AOT retrieval algorithm eXtensible Bremen AErosol Retrieval (XBAER) has been applied to data from the OLCI instrument for the first time to illustrate the feasibility of applying XBAER to the data from this new instrument. The first global retrieval results show similar patterns of aerosol optical thickness, AOT, to those from MODIS and MISR aerosol products. The AOT retrieved from OLCI is validated by comparison with AERONET observations and a correlation coefficient of 0.819 and bias (root mean square) of 0.115 is obtained. The haze episode is well captured by the OLCI-derived AOT product. XBAER is shown to retrieve AOT well from the observations of MERIS and OLCI.

Proximity Effect Correction by Pattern Modified Stencil Mask in Large-Field Projection Electron-Beam Lithography

NASA Astrophysics Data System (ADS)

Kobinata, Hideo; Yamashita, Hiroshi; Nomura, Eiichi; Nakajima, Ken; Kuroki, Yukinori

1998-12-01

A new method for proximity effect correction, suitable for large-field electron-beam (EB) projection lithography with high accelerating voltage, such as SCALPEL and PREVAIL in the case where a stencil mask is used, is discussed. In this lithography, a large-field is exposed by the same dose, and thus, the dose modification method, which is used in the variable-shaped beam and the cell projection methods, cannot be used in this case. In this study, we report on development of a new proximity effect correction method which uses a pattern modified stencil mask suitable for high accelerating voltage and large-field EB projection lithography. In order to obtain the mask bias value, we have investigated linewidth reduction, due to the proximity effect, in the peripheral memory cell area, and found that it could be expressed by a simple function and all the correction parameters were easily determined from only the mask pattern data. The proximity effect for the peripheral array pattern could also be corrected by considering the pattern density. Calculated linewidth deviation was 3% or less for a 0.07-µm-L/S memory cell pattern and 5% or less for a 0.14-µm-line and 0.42-µm-space peripheral array pattern, simultaneously.

The Relationship between MOC Reflex and Masked Threshold

PubMed Central

Garinis, Angela; Werner, Lynne; Abdala, Carolina

2011-01-01

Otoacoustic emission (OAE) amplitude can be reduced by acoustic stimulation. This effect is produced by the medial olivocochlear (MOC) reflex. Past studies have shown that the MOC reflex is related to listening in noise and attention. In the present study, the relationship between strength of the contralateral MOC reflex and masked threshold was investigated in 19 adults. Detection thresholds were determined for a 1000-Hz, 300-ms tone presented simultaneously with one repetition of a 300-ms masker in an ongoing train of 300-ms masker bursts at 600-ms intervals. Three masking conditions were tested: 1) broadband noise 2) a fixed-frequency 4-tone complex masker and 3) a random-frequency 4-tone complex masker. Broadband noise was expected to produce energetic masking and the tonal maskers were expected to produce informational masking in some listeners. DPOAEs were recorded at fine frequency interval from 500 to 4000 Hz, with and without contralateral acoustic stimulation. MOC reflex strength was estimated as a reduction in baseline level and a shift in frequency of DPOAE fine-structure maxima near 1000-Hz. MOC reflex and psychophysical testing were completed in separate sessions. Individuals with poorer thresholds in broadband noise and in random-frequency maskers were found to have stronger MOC reflexes. PMID:21878379

A procedure and program to calculate shuttle mask advantage

NASA Astrophysics Data System (ADS)

Balasinski, A.; Cetin, J.; Kahng, A.; Xu, X.

2006-10-01

A well-known recipe for reducing mask cost component in product development is to place non-redundant elements of layout databases related to multiple products on one reticle plate [1,2]. Such reticles are known as multi-product, multi-layer, or, in general, multi-IP masks. The composition of the mask set should minimize not only the layout placement cost, but also the cost of the manufacturing process, design flow setup, and product design and introduction to market. An important factor is the quality check which should be expeditious and enable thorough visual verification to avoid costly modifications once the data is transferred to the mask shop. In this work, in order to enable the layer placement and quality check procedure, we proposed an algorithm where mask layers are first lined up according to the price and field tone [3]. Then, depending on the product die size, expected fab throughput, and scribeline requirements, the subsequent product layers are placed on the masks with different grades. The actual reduction of this concept to practice allowed us to understand the tradeoffs between the automation of layer placement and setup related constraints. For example, the limited options of the numbers of layer per plate dictated by the die size and other design feedback, made us consider layer pairing based not only on the final price of the mask set, but also on the cost of mask design and fab-friendliness. We showed that it may be advantageous to introduce manual layer pairing to ensure that, e.g., all interconnect layers would be placed on the same plate, allowing for easy and simultaneous design fixes. Another enhancement was to allow some flexibility in mixing and matching of the layers such that non-critical ones requiring low mask grade would be placed in a less restrictive way, to reduce the count of orphan layers. In summary, we created a program to automatically propose and visualize shuttle mask architecture for design verification, with enhancements to due to the actual application of the code.

Development of binary image masks for TPF-C and ground-based AO coronagraphs

NASA Astrophysics Data System (ADS)

Ge, Jian; Crepp, Justin; Vanden Heuvel, Andrew; Miller, Shane; McDavitt, Dan; Kravchenko, Ivan; Kuchner, Marc

2006-06-01

We report progress on the development of precision binary notch-filter focal plane coronagraphic masks for directly imaging Earth-like planets at visible wavelengths with the Terrestrial Planet Finder Coronagraph (TPF-C), and substellar companions at near infrared wavelengths from the ground with coronagraphs coupled to high-order adaptive optics (AO) systems. Our recent theoretical studies show that 8th-order image masks (Kuchner, Crepp & Ge 2005, KCG05) are capable of achieving unlimited dynamic range in an ideal optical system, while simultaneously remaining relatively insensitive to low-spatial-frequency optical aberrations, such as tip/tilt errors, defocus, coma, astigmatism, etc. These features offer a suite of advantages for the TPF-C by relaxing many control and stability requirements, and can also provide resistance to common practical problems associated with ground-based observations; for example, telescope flexure and low-order errors left uncorrected by the AO system due to wavefront sensor-deformable mirror lag time can leak light at significant levels. Our recent lab experiments show that prototype image masks can generate contrast levels on the order of 2x10 -6 at 3 λ/D and 6x10 -7 at 10 λ/D without deformable mirror correction using monochromatic light (Crepp et al. 2006), and that this contrast is limited primarily by light scattered by imperfections in the optics and extra diffraction created by mask construction errors. These experiments also indicate that the tilt and defocus sensitivities of high-order masks follow the theoretical predictions of Shaklan and Green 2005. In this paper, we discuss these topics as well as review our progress on developing techniques for fabricating a new series of image masks that are "free-standing", as such construction designs may alleviate some of the (mostly chromatic) problems associated with masks that rely on glass substrates for mechanical support. Finally, results obtained from our AO coronagraph simulations are provided in the last section. In particular, we find that: (i) apodized masks provide deeper contrast than hard-edge masks when the image quality exceeds 80% Strehl ratio (SR), (ii) above 90% SR, 4th-order band-limited masks provide higher off-axis throughput than Gaussian masks when generating comparable contrast levels, and (iii) below ~90% SR, hard-edge masks may be better suited for high contrast imaging, since they are less susceptible to tip/tilt alignment errors.

Orientation masking and cross-orientation suppression (XOS): implications for estimates of filter bandwidth.

PubMed

Meese, Tim S; Holmes, David J

2010-10-01

Most contemporary models of spatial vision include a cross-oriented route to suppression (masking from a broadly tuned inhibitory pool), which is most potent at low spatial and high temporal frequencies (T. S. Meese & D. J. Holmes, 2007). The influence of this pathway can elevate orientation-masking functions without exciting the target mechanism, and because early psychophysical estimates of filter bandwidth did not accommodate this, it is likely that they have been overestimated for this corner of stimulus space. Here we show that a transient 40% contrast mask causes substantial binocular threshold elevation for a transient vertical target, and this declines from a mask orientation of 0° to about 40° (indicating tuning), and then more gently to 90°, where it remains at a factor of ∼4. We also confirm that cross-orientation masking is diminished or abolished at high spatial frequencies and for sustained temporal modulation. We fitted a simple model of pedestal masking and cross-orientation suppression (XOS) to our data and those of G. C. Phillips and H. R. Wilson (1984) and found the dependency of orientation bandwidth on spatial frequency to be much less than previously supposed. An extension of our linear spatial pooling model of contrast gain control and dilution masking (T. S. Meese & R. J. Summers, 2007) is also shown to be consistent with our results using filter bandwidths of ±20°. Both models include tightly and broadly tuned components of divisive suppression. More generally, because XOS and/or dilution masking can affect the shape of orientation-masking curves, we caution that variations in bandwidth estimates might reflect variations in processes that have nothing to do with filter bandwidth.

Advances in low-defect multilayers for EUVL mask blanks

NASA Astrophysics Data System (ADS)

Folta, James A.; Davidson, J. Courtney; Larson, Cindy C.; Walton, Christopher C.; Kearney, Patrick A.

2002-07-01

Low-defect multilayer coatings are required to fabricate mask blanks for Extreme Ultraviolet Lithography (EUVL). The mask blanks consist of high reflectance EUV multilayers on low thermal expansion substrates. A defect density of 0.0025 printable defects/cm2 for both the mask substrate and the multilayer is required to provide a mask blank yield of 60 percent. Current low defect multilayer coating technology allows repeated coating-added defect levels of 0.05/cm2 for defects greater than 90 nm polystyrene latex sphere (PSL) equivalent size for lots of 20 substrates. Extended clean operation of the coating system at levels below 0.08/cm2 for 3 months of operation has also been achieved. Two substrates with zero added defects in the quality area have been fabricated, providing an existence proof that ultra low defect coatings are possible. Increasing the ion source-to-target distance from 410 to 560 mm to reduce undesired coating of the ion source caused the defect density to increase to 0.2/cm2. Deposition and etching diagnostic witness substrates and deposition pinhole cameras showed a much higher level of ion beam spillover (ions missing the sputter target) than expected. Future work will quantify beam spillover, and test designs to reduce spillover, if it is confirmed to be the cause of the increased defect level. The LDD system will also be upgraded to allow clean coating of standard format mask substrates. The upgrade will confirm that the low defect process developed on Si wafers is compatible with the standard mask format 152 mm square substrates, and will provide a clean supply of EUVL mask blanks needed to support development of EUVL mask patterning processes and clean mask handling technologies.

Radiation beam collimation system and method

DOEpatents

Schmidt, Oliver A.; Ramanathan, Mohan

2015-08-18

The invention provides a method for collimating a radiation beam, the method comprising subjecting the beam to a collimator that yaws and pitches, either separately or simultaneously relative to the incident angle of the beam. Also provided is a system for collimating radiation beams, the system comprising a collimator body, and a stage for pitching and yawing the body. A feature of the invention is that a single, compact mask body defines one or a plurality of collimators having no moving surfaces relative to each other, whereby the entire mask body is moved about a point in space to provide various collimator opening dimensions to oncoming radiation beams.

Simultaneous masking between electric and acoustic stimulation in cochlear implant users with residual low-frequency hearing.

PubMed

Krüger, Benjamin; Büchner, Andreas; Nogueira, Waldo

2017-09-01

Ipsilateral electric-acoustic stimulation (EAS) is becoming increasingly important in cochlear implant (CI) treatment. Improvements in electrode designs and surgical techniques have contributed to improved hearing preservation during implantation. Consequently, CI implantation criteria have been expanded toward people with significant residual low-frequency hearing, who may benefit from the combined use of both the electric and acoustic stimulation in the same ear. However, only few studies have investigated the mutual interaction between electric and acoustic stimulation modalities. This work characterizes the interaction between both stimulation modalities using psychophysical masking experiments and cone beam computer tomography (CBCT). Two psychophysical experiments for electric and acoustic masking were performed to measure the hearing threshold elevation of a probe stimulus in the presence of a masker stimulus. For electric masking, the probe stimulus was an acoustic tone while the masker stimulus was an electric pulse train. For acoustic masking, the probe stimulus was an electric pulse train and the masker stimulus was an acoustic tone. Five EAS users, implanted with a CI and ipsilateral residual low-frequency hearing, participated in the study. Masking was determined at different electrodes and different acoustic frequencies. CBCT scans were used to determine the individual place-pitch frequencies of the intracochlear electrode contacts by using the Stakhovskaya place-to-frequency transformation. This allows the characterization of masking as a function of the difference between electric and acoustic stimulation sites, which we term the electric-acoustic frequency difference (EAFD). The results demonstrate a significant elevation of detection thresholds for both experiments. In electric masking, acoustic-tone thresholds increased exponentially with decreasing EAFD. In contrast, for the acoustic masking experiment, threshold elevations were present regardless of the tested EAFDs. Based on the present findings, we conclude that there is an asymmetry between the electric and the acoustic masker modalities. These observations have implications for the design and fitting of EAS sound-coding strategies. Copyright © 2017 Elsevier B.V. All rights reserved.

Using Zebra-speech to study sequential and simultaneous speech segregation in a cochlear-implant simulation.

PubMed

Gaudrain, Etienne; Carlyon, Robert P

2013-01-01

Previous studies have suggested that cochlear implant users may have particular difficulties exploiting opportunities to glimpse clear segments of a target speech signal in the presence of a fluctuating masker. Although it has been proposed that this difficulty is associated with a deficit in linking the glimpsed segments across time, the details of this mechanism are yet to be explained. The present study introduces a method called Zebra-speech developed to investigate the relative contribution of simultaneous and sequential segregation mechanisms in concurrent speech perception, using a noise-band vocoder to simulate cochlear implants. One experiment showed that the saliency of the difference between the target and the masker is a key factor for Zebra-speech perception, as it is for sequential segregation. Furthermore, forward masking played little or no role, confirming that intelligibility was not limited by energetic masking but by across-time linkage abilities. In another experiment, a binaural cue was used to distinguish the target and the masker. It showed that the relative contribution of simultaneous and sequential segregation depended on the spectral resolution, with listeners relying more on sequential segregation when the spectral resolution was reduced. The potential of Zebra-speech as a segregation enhancement strategy for cochlear implants is discussed.

Using Zebra-speech to study sequential and simultaneous speech segregation in a cochlear-implant simulation

PubMed Central

Gaudrain, Etienne; Carlyon, Robert P.

2013-01-01

Previous studies have suggested that cochlear implant users may have particular difficulties exploiting opportunities to glimpse clear segments of a target speech signal in the presence of a fluctuating masker. Although it has been proposed that this difficulty is associated with a deficit in linking the glimpsed segments across time, the details of this mechanism are yet to be explained. The present study introduces a method called Zebra-speech developed to investigate the relative contribution of simultaneous and sequential segregation mechanisms in concurrent speech perception, using a noise-band vocoder to simulate cochlear implants. One experiment showed that the saliency of the difference between the target and the masker is a key factor for Zebra-speech perception, as it is for sequential segregation. Furthermore, forward masking played little or no role, confirming that intelligibility was not limited by energetic masking but by across-time linkage abilities. In another experiment, a binaural cue was used to distinguish target and masker. It showed that the relative contribution of simultaneous and sequential segregation depended on the spectral resolution, with listeners relying more on sequential segregation when the spectral resolution was reduced. The potential of Zebra-speech as a segregation enhancement strategy for cochlear implants is discussed. PMID:23297922

Wafer hotspot prevention using etch aware OPC correction

NASA Astrophysics Data System (ADS)

Hamouda, Ayman; Power, Dave; Salama, Mohamed; Chen, Ao

2016-03-01

As technology development advances into deep-sub-wavelength nodes, multiple patterning is becoming more essential to achieve the technology shrink requirements. Recently, Optical Proximity Correction (OPC) technology has proposed simultaneous correction of multiple mask-patterns to enable multiple patterning awareness during OPC correction. This is essential to prevent inter-layer hot-spots during the final pattern transfer. In state-of-art literature, multi-layer awareness is achieved using simultaneous resist-contour simulations to predict and correct for hot-spots during mask generation. However, this approach assumes a uniform etch shrink response for all patterns independent of their proximity, which isn't sufficient for the full prevention of inter-exposure hot-spot, for example different color space violations post etch or via coverage/enclosure post etch. In this paper, we explain the need to include the etch component during multiple patterning OPC. We also introduce a novel approach for Etch-aware simultaneous Multiple-patterning OPC, where we calibrate and verify a lumped model that includes the combined resist and etch responses. Adding this extra simulation condition during OPC is suitable for full chip processing from a computation intensity point of view. Also, using this model during OPC to predict and correct inter-exposures hot-spots is similar to previously proposed multiple-patterning OPC, yet our proposed approach more accurately corrects post-etch defects too.

Simultaneous Masking in a Dichotic Emotion Detection Task

ERIC Educational Resources Information Center

Voyer, Daniel; Soraggi, Mariana; Brake, Brandy; Wood, Heather-Dawn

2006-01-01

The present study investigated the possible role of ceiling effects in producing laterality effects of small magnitude in dichotic emotion detection. Twenty two right-handed undergraduate students participated in the present experiment. They were required to detect the presence of a target emotion in the expressions tones of happiness, sadness,…

Study of a coronagraphic mask using evanescent waves.

PubMed

Buisset, Christophe; Rabbia, Yves; Lepine, Thierry; Alagao, Mary-Angelie; Ducrot, Elsa; Poshyachinda, Saran; Soonthornthum, Boonrucksar

2017-04-03

The evanescent wave coronagraph (EvWaCo) is a specific kind of band-limited coronagraph using the frustrated total internal reflection phenomenon to produce the coronagraphic effect (removing starlight from the image plane in order to make the stellar environment detectable). In this paper, we present a theoretical and experimental study of the EvWaCo coronagraphic mask. First, we calculate the theoretical transmission and we show that this mask is partially achromatic. Then, we present the experimental results obtained in unpolarized light at the wavelength λ≈900 nm and relative spectral bandwidth Δλ/λ≈6%. In particular, we show that the coronagraph provides a contrast down to a few 10^-6 at an angular distance of about ten Airy radii.

Clean induced feature CD shift of EUV mask

NASA Astrophysics Data System (ADS)

Nesládek, Pavel; Schedel, Thorsten; Bender, Markus

2016-05-01

EUV developed in the last decade to the most promising <7nm technology candidate. Defects are considered to be one of the most critical issues of the EUV mask. There are several contributors which make the EUV mask so different from the optical one. First one is the significantly more complicated mask stack consisting currently of 40 Mo/Si double layers, covered by Ru capping layer and TaN/TaO absorber/anti-reflective coating on top of the front face of the mask. Backside is in contrary to optical mask covered as well by conductive layer consisting of Cr or CrN. Second contributor is the fact that EUV mask is currently in contrary to optical mask not yet equipped with sealed pellicle, leading to much higher risk of mask contamination. Third reason is use of EUV mask in vacuum, possibly leading to deposition of vacuum contaminants on the EUV mask surface. Latter reason in combination with tight requirements on backside cleanliness lead to the request of frequent recleaning of the EUV mask, in order to sustain mask lifetime similar to that of optical mask. Mask cleaning process alters slightly the surface of any mask - binary COG mask, as well as phase shift mask of any type and naturally also of the EUV mask as well. In case of optical masks the changes are almost negligible, as the mask is exposed to max. 10-20 re-cleans within its life time. These modifications can be expressed in terms of different specified parameters, e.g. CD shift, phase/trans shift, change of the surface roughness etc. The CD shift, expressed as thinning (or exceptionally thickening) of the dark features on the mask is typically in order of magnitude 0.1nm per process run, which is completely acceptable for optical mask. Projected on the lifetime of EUV mask, assuming 100 clean process cycles, this will lead to CD change of about 10nm. For this reason the requirements for EUV mask cleaning are significantly tighter, << 0.1 nm per process run. This task will look even more challenging, when considering, that the tools for CD measurement at the EUV mask are identical as for optical mask. There is one aspect influencing the CD shift, which demands attention. The mask composition of the EUV mask is significantly different from the optical mask. More precisely there are 2 materials influencing the estimated CD in case of EUV mask, whereas there is one material only in case of optical masks, in first approximation. For optical masks, the CD changes can be attributed to modification of the absorber/ARC layer, as the quartz substrate can be hardly modified by the wet process. For EUV Masks chemical modification of the Ru capping layer - thinning, oxidization etc. are rather more probable and we need to take into account, how this effects can influence the CD measurement process. CD changes measured can be interpreted as either change in the feature size, or modification of the chemical nature of both absorber/ARC layer stack and the Ru capping layer. In our work we try to separate the effect of absorber and Ru/capping layer on the CD shift observed and propose independent way of estimation both parameters.

Current status of x-ray mask manufacturing at the Microlithographic Mask Development Center

NASA Astrophysics Data System (ADS)

Kimmel, Kurt R.; Hughes, Patrick J.

1996-07-01

The Microlithographic Mask Development Center (MMD) has been the focal point of X-ray mask development efforts in the United States since its inception in 1993. Funded by the Advanced Research Projects Agency (ARPA), and with technical support from the Proximity X-ray Lithography Association (AT&T, IBM, Loral Federal Systems, and Motorola) the MMD has recently made dramatic advances in mask fabrication. Numerous defect-free 64Mb and 256Mb DRAM masks have been made on both boron-doped silicon and silicon carbide substrates. Image-placement error of less than 35nm 3 sigma is achieved with high yield. Image-size (critical dimension) control of 25nm 3 sigma on 250nm nominal images is representative performance. This progress is being made in a manufacturing environment with significant volumes, multiple customers, multiple substrate configurations, and fast turnaround-time (TAT) requirements. The MMD state-of-the-art equipment infrastructure has made much of this progress possible. This year the MMD qualified the EL-4, an IBM-designed-and-built variable-shaped-spot e-beam system. The fundamental performance parameters of this system will be described. Operational techniques of multiple partial exposure writing and product specific emulation (PSE) have been implemented to improve image-placement accuracy with remarkable success. Image-size control was studied in detail with contributory components separated. Defect density was systematically reduced to yield defect-free masks while simultaneously tightening inspection criteria. Information about these and other recent engineering highlights will be reported. An outline of the primary engineering challenges and goals for 1996 and status of progress toward 100 nm design rule capability will also be given.

Magnetron sputtering for the production of EUV mask blanks

NASA Astrophysics Data System (ADS)

Kearney, Patrick; Ngai, Tat; Karumuri, Anil; Yum, Jung; Lee, Hojune; Gilmer, David; Vo, Tuan; Goodwin, Frank

2015-03-01

Ion Beam Deposition (IBD) has been the primary technique used to deposit EUV mask blanks since 1995 when it was discovered it could produce multilayers with few defects. Since that time the IBD technique has been extensively studied and improved and is finally approaching usable defectivities. But in the intervening years, the defectivity of magnetron sputtering has been greatly improved. This paper evaluates the suitability of a modern magnetron tool to produce EUV mask blanks and the ability to support HVM production. In particular we show that the reflectivity and uniformity of these tools are superior to current generation IBD tools, and that the magnetron tools can produce EUV films with defect densities comparable to recent best IBD tool performance. Magnetron tools also offer many advantages in manufacturability and tool throughput; however, challenges remain, including transitioning the magnetron tools from the wafer to mask formats. While work continues on quantifying the capability of magnetron sputtering to meet the mask blank demands of the industry, for the most part the remaining challenges do not require any fundamental improvements to existing technology. Based on the recent results and the data presented in this paper there is a clear indication that magnetron deposition should be considered for the future of EUV mask blank production.

Informational masking of speech in children: Effects of ipsilateral and contralateral distracters

NASA Astrophysics Data System (ADS)

Wightman, Frederic L.; Kistler, Doris J.

2005-11-01

Using a closed-set speech recognition paradigm thought to be heavily influenced by informational masking, auditory selective attention was measured in 38 children (ages 4-16 years) and 8 adults (ages 20-30 years). The task required attention to a monaural target speech message that was presented with a time-synchronized distracter message in the same ear. In some conditions a second distracter message or a speech-shaped noise was presented to the other ear. Compared to adults, children required higher target/distracter ratios to reach comparable performance levels, reflecting more informational masking in these listeners. Informational masking in most conditions was confirmed by the fact that a large proportion of the errors made by the listeners were contained in the distracter message(s). There was a monotonic age effect, such that even the children in the oldest age group (13.6-16 years) demonstrated poorer performance than adults. For both children and adults, presentation of an additional distracter in the contralateral ear significantly reduced performance, even when the distracter messages were produced by a talker of different sex than the target talker. The results are consistent with earlier reports from pure-tone masking studies that informational masking effects are much larger in children than in adults.

An automatic iris occlusion estimation method based on high-dimensional density estimation.

PubMed

Li, Yung-Hui; Savvides, Marios

2013-04-01

Iris masks play an important role in iris recognition. They indicate which part of the iris texture map is useful and which part is occluded or contaminated by noisy image artifacts such as eyelashes, eyelids, eyeglasses frames, and specular reflections. The accuracy of the iris mask is extremely important. The performance of the iris recognition system will decrease dramatically when the iris mask is inaccurate, even when the best recognition algorithm is used. Traditionally, people used the rule-based algorithms to estimate iris masks from iris images. However, the accuracy of the iris masks generated this way is questionable. In this work, we propose to use Figueiredo and Jain's Gaussian Mixture Models (FJ-GMMs) to model the underlying probabilistic distributions of both valid and invalid regions on iris images. We also explored possible features and found that Gabor Filter Bank (GFB) provides the most discriminative information for our goal. Finally, we applied Simulated Annealing (SA) technique to optimize the parameters of GFB in order to achieve the best recognition rate. Experimental results show that the masks generated by the proposed algorithm increase the iris recognition rate on both ICE2 and UBIRIS dataset, verifying the effectiveness and importance of our proposed method for iris occlusion estimation.

Observation of EUVL mask using coherent EUV scatterometry microscope with high-harmonic-generation EUV source

NASA Astrophysics Data System (ADS)

Mamezaki, Daiki; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo

2017-07-01

In extreme ultraviolet (EUV) lithography, development of review tools for EUV mask pattern and phase defect at working wavelength of 13.5 nm is required. The EUV mask is composed of an absorber pattern (50 - 70 nm thick) and Mo/Si multilayer (280 nm thick) on a glass substrate. This mask pattern seems three-dimensional (3D) structure. This 3D structure would modulate EUV reflection phase, which would cause focus and pattern shifts. Thus, EUV phase imaging is important to evaluate this phase modulation. We have developed coherent EUV scatterometry microscope (CSM), which is a simple microscope without objective optics. EUV phase and intensity image are reconstructed with diffraction images by ptychography with coherent EUV illumination. The high-harmonic-generation (HHG) EUV source was employed for standalone CSM system. In this study, we updated HHG system of pump-laser reduction and gas-pressure control. Two types of EUV mask absorber patterns were observed. An 88-nm lines-and-spaces and a cross-line patterns were clearly reconstructed by ptychography. In addition, a natural defect with 2-μm diameter on the cross-line was well reconstructed. This demonstrated the high capability of the standalone CSM, which system will be used in the factories, such as mask shops and semiconductor fabrication plants.

EUV mask manufacturing readiness in the merchant mask industry

NASA Astrophysics Data System (ADS)

Green, Michael; Choi, Yohan; Ham, Young; Kamberian, Henry; Progler, Chris; Tseng, Shih-En; Chiou, Tsann-Bim; Miyazaki, Junji; Lammers, Ad; Chen, Alek

2017-10-01

As nodes progress into the 7nm and below regime, extreme ultraviolet lithography (EUVL) becomes critical for all industry participants interested in remaining at the leading edge. One key cost driver for EUV in the supply chain is the reflective EUV mask. As of today, the relatively few end users of EUV consist primarily of integrated device manufactures (IDMs) and foundries that have internal (captive) mask manufacturing capability. At the same time, strong and early participation in EUV by the merchant mask industry should bring value to these chip makers, aiding the wide-scale adoption of EUV in the future. For this, merchants need access to high quality, representative test vehicles to develop and validate their own processes. This business circumstance provides the motivation for merchants to form Joint Development Partnerships (JDPs) with IDMs, foundries, Original Equipment Manufacturers (OEMs) and other members of the EUV supplier ecosystem that leverage complementary strengths. In this paper, we will show how, through a collaborative supplier JDP model between a merchant and OEM, a novel, test chip driven strategy is applied to guide and validate mask level process development. We demonstrate how an EUV test vehicle (TV) is generated for mask process characterization in advance of receiving chip maker-specific designs. We utilize the TV to carry out mask process "stress testing" to define process boundary conditions which can be used to create Mask Rule Check (MRC) rules as well as serve as baseline conditions for future process improvement. We utilize Advanced Mask Characterization (AMC) techniques to understand process capability on designs of varying complexity that include EUV OPC models with and without sub-resolution assist features (SRAFs). Through these collaborations, we demonstrate ways to develop EUV processes and reduce implementation risks for eventual mass production. By reducing these risks, we hope to expand access to EUV mask capability for the broadest community possible as the technology is implemented first within and then beyond the initial early adopters.

Influence of Temporal Expectations on Response Priming by Subliminal Faces

PubMed Central

Guex, Raphael; Vuilleumier, Patrik

2016-01-01

Unconscious processes are often assumed immune from attention influence. Recent behavioral studies suggest however that the processing of subliminal information can be influenced by temporal attention. To examine the neural mechanisms underlying these effects, we used a stringent masking paradigm together with fMRI to investigate how temporal attention modulates the processing of unseen (masked) faces. Participants performed a gender decision task on a visible neutral target face, preceded by a masked prime face that could vary in gender (same or different than target) and emotion expression (neutral or fearful). We manipulated temporal attention by instructing participants to expect targets to appear either early or late during the stimulus sequence. Orienting temporal attention to subliminal primes influenced response priming by masked faces, even when gender was incongruent. In addition, gender-congruent primes facilitated responses regardless of attention while gender-incongruent primes reduced accuracy when attended. Emotion produced no differential effects. At the neural level, incongruent and temporally unexpected primes increased brain response in regions of the fronto-parietal attention network, reflecting greater recruitment of executive control and reorienting processes. Congruent and expected primes produced higher activations in fusiform cortex, presumably reflecting facilitation of perceptual processing. These results indicate that temporal attention can influence subliminal processing of face features, and thus facilitate information integration according to task-relevance regardless of conscious awareness. They also suggest that task-congruent information between prime and target may facilitate response priming even when temporal attention is not selectively oriented to the prime onset time. PMID:27764124

Influence of Temporal Expectations on Response Priming by Subliminal Faces.

PubMed

Pichon, Swann; Guex, Raphael; Vuilleumier, Patrik

2016-01-01

Unconscious processes are often assumed immune from attention influence. Recent behavioral studies suggest however that the processing of subliminal information can be influenced by temporal attention. To examine the neural mechanisms underlying these effects, we used a stringent masking paradigm together with fMRI to investigate how temporal attention modulates the processing of unseen (masked) faces. Participants performed a gender decision task on a visible neutral target face, preceded by a masked prime face that could vary in gender (same or different than target) and emotion expression (neutral or fearful). We manipulated temporal attention by instructing participants to expect targets to appear either early or late during the stimulus sequence. Orienting temporal attention to subliminal primes influenced response priming by masked faces, even when gender was incongruent. In addition, gender-congruent primes facilitated responses regardless of attention while gender-incongruent primes reduced accuracy when attended. Emotion produced no differential effects. At the neural level, incongruent and temporally unexpected primes increased brain response in regions of the fronto-parietal attention network, reflecting greater recruitment of executive control and reorienting processes. Congruent and expected primes produced higher activations in fusiform cortex, presumably reflecting facilitation of perceptual processing. These results indicate that temporal attention can influence subliminal processing of face features, and thus facilitate information integration according to task-relevance regardless of conscious awareness. They also suggest that task-congruent information between prime and target may facilitate response priming even when temporal attention is not selectively oriented to the prime onset time.

Processing load induced by informational masking is related to linguistic abilities.

PubMed

Koelewijn, Thomas; Zekveld, Adriana A; Festen, Joost M; Rönnberg, Jerker; Kramer, Sophia E

2012-01-01

It is often assumed that the benefit of hearing aids is not primarily reflected in better speech performance, but that it is reflected in less effortful listening in the aided than in the unaided condition. Before being able to assess such a hearing aid benefit the present study examined how processing load while listening to masked speech relates to inter-individual differences in cognitive abilities relevant for language processing. Pupil dilation was measured in thirty-two normal hearing participants while listening to sentences masked by fluctuating noise or interfering speech at either 50% and 84% intelligibility. Additionally, working memory capacity, inhibition of irrelevant information, and written text reception was tested. Pupil responses were larger during interfering speech as compared to fluctuating noise. This effect was independent of intelligibility level. Regression analysis revealed that high working memory capacity, better inhibition, and better text reception were related to better speech reception thresholds. Apart from a positive relation to speech recognition, better inhibition and better text reception are also positively related to larger pupil dilation in the single-talker masker conditions. We conclude that better cognitive abilities not only relate to better speech perception, but also partly explain higher processing load in complex listening conditions.

Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control

NASA Astrophysics Data System (ADS)

Kojima, Yosuke; Shirasaki, Masanori; Chiba, Kazuaki; Tanaka, Tsuyoshi; Inazuki, Yukio; Yoshikawa, Hiroki; Okazaki, Satoshi; Iwase, Kazuya; Ishikawa, Kiichi; Ozawa, Ken

2007-05-01

For 45 nm node and beyond, the alternating phase-shift mask (alt. PSM), one of the most expected resolution enhancement technologies (RET) because of its high image contrast and small mask error enhancement factor (MEEF), and the binary mask (BIM) attract attention. Reducing CD and registration errors and defect are their critical issues. As the solution, the new blank for alt. PSM and BIM is developed. The top film of new blank is thin Cr, and the antireflection film and shielding film composed of MoSi are deposited under the Cr film. The mask CD performance is evaluated for through pitch, CD linearity, CD uniformity, global loading, resolution and pattern fidelity, and the blank performance is evaluated for optical density, reflectivity, sheet resistance, flatness and defect level. It is found that the performance of new blank is equal to or better than that of conventional blank in all items. The mask CD performance shows significant improvement. The lithography performance of new blank is confirmed by wafer printing and AIMS measurement. The full dry type alt. PSM has been used as test plate, and the test results show that new blank can almost meet the specifications of pi-0 CD difference, CD uniformity and process margin for 45 nm node. Additionally, the new blank shows the better pattern fidelity than that of conventional blank on wafer. AIMS results are almost same as wafer results except for the narrowest pattern. Considering the result above, this new blank can reduce the mask error factors of alt. PSM and BIM for 45 nm node and beyond.

Small Aperture Telescope Observations of Co-located Geostationary Satellites

NASA Astrophysics Data System (ADS)

Scott, R.; Wallace, B.

As geostationary orbit (GEO) continues to be populated, satellite operators are increasing usage of co-location techniques to maximize usage of fewer GEO longitude slots. Co-location is an orbital formation strategy where two or more geostationary satellites reside within one GEO stationkeeping box. The separation strategy used to prevent collision between the co-located satellites generally uses eccentricity (radial separation) and inclination (latitude separation) vector offsets. This causes the satellites to move in relative motion ellipses about each other as the relative longitude drift between the satellites is near zero. Typical separations between the satellites varies from 1 to 100 kilometers. When co-located satellites are observed by optical ground based space surveillance sensors the participants appear to be separated by a few minutes of arc or less in angular extent. Under certain viewing geometries, these satellites appear to visually conjunct even though the satellites are, in fact, well separated spatially. In situations where one of the co-located satellites is more optically reflective than the other, the reflected sunglint from the more reflective satellite can overwhelm the other. This less frequently encountered issue causes the less reflective satellite to be glint masked in the glare of the other. This paper focuses on space surveillance observations on co-located Canadian satellites using a small optical telescope operated by Defence R&D Canada - Ottawa. The two above mentioned problems (cross tagging and glint masking) are investigated and we quantify the results for Canadian operated geostationary satellites. The performance of two line element sets when making in-frame CCD image correlation between the co-located satellites is also examined. Relative visual magnitudes between the co-located members are also inspected and quantified to determine the susceptibility of automated telescopes to glint masking of co-located satellite members.

Automatic classification of blank substrate defects

NASA Astrophysics Data System (ADS)

Boettiger, Tom; Buck, Peter; Paninjath, Sankaranarayanan; Pereira, Mark; Ronald, Rob; Rost, Dan; Samir, Bhamidipati

2014-10-01

Mask preparation stages are crucial in mask manufacturing, since this mask is to later act as a template for considerable number of dies on wafer. Defects on the initial blank substrate, and subsequent cleaned and coated substrates, can have a profound impact on the usability of the finished mask. This emphasizes the need for early and accurate identification of blank substrate defects and the risk they pose to the patterned reticle. While Automatic Defect Classification (ADC) is a well-developed technology for inspection and analysis of defects on patterned wafers and masks in the semiconductors industry, ADC for mask blanks is still in the early stages of adoption and development. Calibre ADC is a powerful analysis tool for fast, accurate, consistent and automatic classification of defects on mask blanks. Accurate, automated classification of mask blanks leads to better usability of blanks by enabling defect avoidance technologies during mask writing. Detailed information on blank defects can help to select appropriate job-decks to be written on the mask by defect avoidance tools [1][4][5]. Smart algorithms separate critical defects from the potentially large number of non-critical defects or false defects detected at various stages during mask blank preparation. Mechanisms used by Calibre ADC to identify and characterize defects include defect location and size, signal polarity (dark, bright) in both transmitted and reflected review images, distinguishing defect signals from background noise in defect images. The Calibre ADC engine then uses a decision tree to translate this information into a defect classification code. Using this automated process improves classification accuracy, repeatability and speed, while avoiding the subjectivity of human judgment compared to the alternative of manual defect classification by trained personnel [2]. This paper focuses on the results from the evaluation of Automatic Defect Classification (ADC) product at MP Mask Technology Center (MPMask). The Calibre ADC tool was qualified on production mask blanks against the manual classification. The classification accuracy of ADC is greater than 95% for critical defects with an overall accuracy of 90%. The sensitivity to weak defect signals and locating the defect in the images is a challenge we are resolving. The performance of the tool has been demonstrated on multiple mask types and is ready for deployment in full volume mask manufacturing production flow. Implementation of Calibre ADC is estimated to reduce the misclassification of critical defects by 60-80%.

Implementation of PSF engineering in high-resolution 3D microscopy imaging with a LCoS (reflective) SLM

NASA Astrophysics Data System (ADS)

King, Sharon V.; Doblas, Ana; Patwary, Nurmohammed; Saavedra, Genaro; Martínez-Corral, Manuel; Preza, Chrysanthe

2014-03-01

Wavefront coding techniques are currently used to engineer unique point spread functions (PSFs) that enhance existing microscope modalities or create new ones. Previous work in this field demonstrated that simulated intensity PSFs encoded with a generalized cubic phase mask (GCPM) are invariant to spherical aberration or misfocus; dependent on parameter selection. Additional work demonstrated that simulated PSFs encoded with a squared cubic phase mask (SQUBIC) produce a depth invariant focal spot for application in confocal scanning microscopy. Implementation of PSF engineering theory with a liquid crystal on silicon (LCoS) spatial light modulator (SLM) enables validation of WFC phase mask designs and parameters by manipulating optical wavefront properties with a programmable diffractive element. To validate and investigate parameters of the GCPM and SQUBIC WFC masks, we implemented PSF engineering in an upright microscope modified with a dual camera port and a LCoS SLM. We present measured WFC PSFs and compare them to simulated PSFs through analysis of their effect on the microscope imaging system properties. Experimentally acquired PSFs show the same intensity distribution as simulation for the GCPM phase mask, the SQUBIC-mask and the well-known and characterized cubic-phase mask (CPM), first applied to high NA microscopy by Arnison et al.10, for extending depth of field. These measurements provide experimental validation of new WFC masks and demonstrate the use of the LCoS SLM as a WFC design tool. Although efficiency improvements are needed, this application of LCoS technology renders the microscope capable of switching among multiple WFC modes.

Musical experience sharpens human cochlear tuning.

PubMed

Bidelman, Gavin M; Nelms, Caitlin; Bhagat, Shaum P

2016-05-01

The mammalian cochlea functions as a filter bank that performs a spectral, Fourier-like decomposition on the acoustic signal. While tuning can be compromised (e.g., broadened with hearing impairment), whether or not human cochlear frequency resolution can be sharpened through experiential factors (e.g., training or learning) has not yet been established. Previous studies have demonstrated sharper psychophysical tuning curves in trained musicians compared to nonmusicians, implying superior peripheral tuning. However, these findings are based on perceptual masking paradigms, and reflect engagement of the entire auditory system rather than cochlear tuning, per se. Here, by directly mapping physiological tuning curves from stimulus frequency otoacoustic emissions (SFOAEs)-cochlear emitted sounds-we show that estimates of human cochlear tuning in a high-frequency cochlear region (4 kHz) is further sharpened (by a factor of 1.5×) in musicians and improves with the number of years of their auditory training. These findings were corroborated by measurements of psychophysical tuning curves (PTCs) derived via simultaneous masking, which similarly showed sharper tuning in musicians. Comparisons between SFOAE and PTCs revealed closer correspondence between physiological and behavioral curves in musicians, indicating that tuning is also more consistent between different levels of auditory processing in trained ears. Our findings demonstrate an experience-dependent enhancement in the resolving power of the cochlear sensory epithelium and the spectral resolution of human hearing and provide a peripheral account for the auditory perceptual benefits observed in musicians. Both local and feedback (e.g., medial olivocochlear efferent) mechanisms are discussed as potential mechanisms for experience-dependent tuning. Copyright © 2016 Elsevier B.V. All rights reserved.

Production of Arctic Sea-ice Albedo by fusion of MISR and MODIS data

NASA Astrophysics Data System (ADS)

Kharbouche, Said; Muller, Jan-Peter

2017-04-01

We have combined data from the NASA MISR and MODIS spectro-radiometers to create a cloud-free albedo dataset specifically for sea-ice. The MISR (Multi-Angular Spectro-Radiometer) instrument on board Terra satellite has a unique ability to create high-quality Bidirectional Reflectance (BRF) over a 7 minute time interval per single overpass, thanks to its 9 cameras of different view angles (±70°,±60°,±45°,±26°). However, as MISR is limited to narrow spectral bands (443nm, 555nm, 670nm, 865nm), which is not sufficient to mask cloud effectively and robustly, we have used the sea-ice mask MOD09 product (Collection 6) from MODIS (Moderate resolution Imaging Spectoradiometer) instrument, which is also on board Terra satellite and acquiring data simultaneously. Only We have created a new and consistent sea-ice (for Arctic) albedo product that is daily, from 1st March to 22nd September for each and every year between 2000 to 2016 at two spatial grids, 1km x 1km and 5km x 5km in polar stereographic projection. Their analysis is described in a separate report [1]. References [1] Muller & Kharbouche, Variation of Arctic's Sea-ice Albedo between 2000 and 2016 by fusion of MISR and MODIS data. This conference. Acknowledgements This work was supported by www.QA4ECV.eu, a project of European Union's Seventh Framework Programme (FP7/2007-2013) under grant agreement no. 607405. We thank our colleagues at JPL and NASA LaRC for processing these data, especially Sebastian Val and Steve Protack.

Binaural unmasking with multiple adjacent masking electrodes in bilateral cochlear implant users

PubMed Central

Lu, Thomas; Litovsky, Ruth; Zeng, Fan-Gang

2011-01-01

Bilateral cochlear implant (BiCI) users gain an advantage in noisy situations from a second implant, but their bilateral performance falls short of normal hearing listeners. Channel interactions due to overlapping electrical fields between electrodes can impair speech perception, but its role in limiting binaural hearing performance has not been well characterized. To address the issue, binaural masking level differences (BMLD) for a 125 Hz tone in narrowband noise were measured using a pair of pitch-matched electrodes while simultaneously presenting the same masking noise to adjacent electrodes, representing a more realistic stimulation condition compared to prior studies that used only a single electrode pair. For five subjects, BMLDs averaged 8.9 ± 1.0 dB (mean ± s.e.) in single electrode pairs but dropped to 2.1 ± 0.4 dB when presenting noise on adjacent masking electrodes, demonstrating a negative impact of the additional maskers. Removing the masking noise from only the pitch-matched electrode pair not only lowered thresholds but also resulted in smaller BMLDs. The degree of channel interaction estimated from auditory nerve evoked potentials in three subjects was significantly and negatively correlated with BMLD. The data suggest that if the amount of channel interactions can be reduced, BiCI users may experience some performance improvements related to binaural hearing. PMID:21682415

Microstructural investigation using synchrotron radiation X-ray microtomography reveals taste-masking mechanism of acetaminophen microspheres.

PubMed

Guo, Zhen; Yin, Xianzhen; Liu, Congbiao; Wu, Li; Zhu, Weifeng; Shao, Qun; York, Peter; Patterson, Laurence; Zhang, Jiwen

2016-02-29

The structure of solid drug delivery systems has considerable influence on drug release behaviors from particles and granules and also impacts other properties relevant to release characteristics such as taste. In this study, lipid-based microspheres of acetaminophen were prepared to mask the undesirable taste of drug and therefore to identify the optimal formulation for drug release. Synchrotron radiation X-ray computed microtomography (SR-μCT) was used to investigate the fine structural architectures of microspheres non-destructively at different sampling times during drug release test, which were simultaneously determined to quantitatively correlate the structural data with drug release behaviors. The results demonstrated that the polymeric formulation component, namely, cationic polymethacrylate (Eudragit E100), was the key factor to mask the bitter taste of acetaminophen by inhibiting immediate drug release thereby reducing the interaction intensity of the bitter material with the oral cavity taste buds. The structure and morphology of the microspheres were found to be influenced by the shape and particle size of the drug, which was also an important factor for taste-masking performance. The quantitative analysis generated detailed structural information which was correlated well with drug release behaviors. Thus, SR-μCT has been proved as a powerful tool to investigate the fine microstructure of particles and provides a new approach in the design of particles for taste masking. Copyright © 2015 Elsevier B.V. All rights reserved.

Cognitive processing load across a wide range of listening conditions: insights from pupillometry.

PubMed

Zekveld, Adriana A; Kramer, Sophia E

2014-03-01

The pupil response to speech masked by interfering speech was assessed across an intelligibility range from 0% to 99% correct. In total, 37 participants aged between 18 and 36 years and with normal hearing were included. Pupil dilation was largest at intermediate intelligibility levels, smaller at high intelligibility, and slightly smaller at very difficult levels. Participants who reported that they often gave up listening at low intelligibility levels had smaller pupil dilations in these conditions. Participants who were good at reading masked text had relatively large pupil dilation when intelligibility was low. We conclude that the pupil response is sensitive to processing load, and possibly reflects cognitive overload in difficult conditions. It seems affected by methodological aspects and individual abilities, but does not reflect subjective ratings. Copyright © 2014 Society for Psychophysiological Research.

Design and development of next-generation bottom anti-reflective coatings for 45nm process with hyper NA lithography

NASA Astrophysics Data System (ADS)

Nakajima, Makoto; Sakaguchi, Takahiro; Hashimoto, Keisuke; Sakamoto, Rikimaru; Kishioka, Takahiro; Takei, Satoshi; Enomoto, Tomoyuki; Nakajima, Yasuyuki

2006-03-01

Integrated circuit manufacturers are consistently seeking to minimize device feature dimensions in order to reduce chip size and increase integration level. Feature sizes on chips are achieved sub 65nm with the advanced 193nm microlithography process. R&D activities of 45nm process have been started so far, and 193nm lithography is used for this technology. The key parameters for this lithography process are NA of exposure tool, resolution capability of resist, and reflectivity control with bottom anti-reflective coating (BARC). In the point of etching process, single-layer resist process can't be applied because resist thickness is too thin for getting suitable aspect ratio. Therefore, it is necessary to design novel BARC system and develop hard mask materials having high etching selectivity. This system and these materials can be used for 45nm generation lithography. Nissan Chemical Industries, Ltd. and Brewer Science, Inc. have been designed and developed the advanced BARCs for the above propose. In order to satisfy our target, we have developed novel BARC and hard mask materials. We investigated the multi-layer resist process stacked 4 layers (resist / thin BARC / silicon-contained BARC (Si-ARC) / spin on carbon hard mask (SOC)) (4 layers process). 4 layers process showed the excellent lithographic performance and pattern transfer performance. In this paper, we will discuss the detail of our approach and materials for 4 layers process.

A Dynamic Compressive Gammachirp Auditory Filterbank

PubMed Central

Irino, Toshio; Patterson, Roy D.

2008-01-01

It is now common to use knowledge about human auditory processing in the development of audio signal processors. Until recently, however, such systems were limited by their linearity. The auditory filter system is known to be level-dependent as evidenced by psychophysical data on masking, compression, and two-tone suppression. However, there were no analysis/synthesis schemes with nonlinear filterbanks. This paper describe18300060s such a scheme based on the compressive gammachirp (cGC) auditory filter. It was developed to extend the gammatone filter concept to accommodate the changes in psychophysical filter shape that are observed to occur with changes in stimulus level in simultaneous, tone-in-noise masking. In models of simultaneous noise masking, the temporal dynamics of the filtering can be ignored. Analysis/synthesis systems, however, are intended for use with speech sounds where the glottal cycle can be long with respect to auditory time constants, and so they require specification of the temporal dynamics of auditory filter. In this paper, we describe a fast-acting level control circuit for the cGC filter and show how psychophysical data involving two-tone suppression and compression can be used to estimate the parameter values for this dynamic version of the cGC filter (referred to as the “dcGC” filter). One important advantage of analysis/synthesis systems with a dcGC filterbank is that they can inherit previously refined signal processing algorithms developed with conventional short-time Fourier transforms (STFTs) and linear filterbanks. PMID:19330044

Rapid Parallel Semantic Processing of Numbers without Awareness

ERIC Educational Resources Information Center

Van Opstal, Filip; de Lange, Floris P.; Dehaene, Stanislas

2011-01-01

In this study, we investigate whether multiple digits can be processed at a semantic level without awareness, either serially or in parallel. In two experiments, we presented participants with two successive sets of four simultaneous Arabic digits. The first set was masked and served as a subliminal prime for the second, visible target set.…

Sexually selected UV signals in the tropical ornate jumping spider, Cosmophasis umbratica may incur costs from predation

PubMed Central

Bulbert, Matthew W; O'Hanlon, James C; Zappettini, Shane; Zhang, Shichang; Li, Daiqin

2015-01-01

Sexually selected ornaments and signals are costly to maintain if they are maladaptive in nonreproductive contexts. The jumping spider Cosmophasis umbratica exhibits distinct sexual dichromatism with males displaying elaborate UV body markings that signal male quality. Female C. umbratica respond favorably to UV-reflecting males and ignore males that have their UV masked. However, Portia labiata, a UV-sensitive spider-eating specialist and a natural predator of C. umbratica, is known to use UV reflectance as a cue when hunting prey. We investigated the cost of these UV signals in C. umbratica in terms of their predation risk. Under experimental conditions, three choice scenarios were presented to P. labiata individuals. Choices by P. labiata were made between male C. umbratica with and without the UV signal; a UV-reflecting male and non-UV-reflecting female; and a UV-masked male and female. The presence and absence of UV signals was manipulated using an optical filter. Portia labiata exhibited a strong bias toward UV+ individuals. These results suggest the sexually selected trait of UV reflectance increases the visibility of males to UV-sensitive predators. The extent of this male-specific UV signal then is potentially moderated by predation pressure. Interestingly though, P. labiata still preferred males to females irrespective of whether UV reflectance was present or not. This suggests P. labiata can switch cues when conditions to detect UV reflectance are not optimal. PMID:25750717

Computer assisted video analysis of swimming performance in a forced swim test: simultaneous assessment of duration of immobility and swimming style in mice selected for high and low swim-stress induced analgesia.

PubMed

Juszczak, Grzegorz R; Lisowski, Paweł; Sliwa, Adam T; Swiergiel, Artur H

2008-10-20

In behavioral pharmacology, two problems are encountered when quantifying animal behavior: 1) reproducibility of the results across laboratories, especially in the case of manual scoring of animal behavior; 2) presence of different behavioral idiosyncrasies, common in genetically different animals, that mask or mimic the effects of the experimental treatments. This study aimed to develop an automated method enabling simultaneous assessment of the duration of immobility in mice and the depth of body submersion during swimming by means of computer assisted video analysis system (EthoVision from Noldus). We tested and compared parameters of immobility based either on the speed of an object (animal) movement or based on the percentage change in the object's area between the consecutive video frames. We also examined the effects of an erosion-dilation filtering procedure on the results obtained with both parameters of immobility. Finally, we proposed an automated method enabling assessment of depth of body submersion that reflects swimming performance. It was found that both parameters of immobility were sensitive to the effect of an antidepressant, desipramine, and that they yielded similar results when applied to mice that are good swimmers. The speed parameter was, however, more sensitive and more reliable because it depended less on random noise of the video image. Also, it was established that applying the erosion-dilation filtering procedure increased the reliability of both parameters of immobility. In case of mice that were poor swimmers, the assessed duration of immobility differed depending on a chosen parameter, thus resulting in the presence or lack of differences between two lines of mice that differed in swimming performance. These results substantiate the need for assessing swimming performance when the duration of immobility in the FST is compared in lines that differ in their swimming "styles". Testing swimming performance can also be important in the studies investigating the effects of swim stress on other behavioral or physiological parameters because poor swimming abilities displayed by some lines can increase severity of swim stress, masking the between-line differences or the main treatment effects.

A mask manufacturer's perspective on maskless lithography

NASA Astrophysics Data System (ADS)

Buck, Peter; Biechler, Charles; Kalk, Franklin

2005-11-01

Maskless Lithography (ML2) is again being considered for use in mainstream CMOS IC manufacturing. Sessions at technical conferences are being devoted to ML2. A multitude of new companies have been formed in the last several years to apply new concepts to breaking the throughput barrier that has in the past prevented ML2 from achieving the cost and cycle time performance necessary to become economically viable, except in rare cases. Has Maskless Lithography's (we used to call it "Direct Write Lithography") time really come? If so, what is the expected impact on the mask manufacturer and does it matter? The lithography tools used today in mask manufacturing are similar in concept to ML2 except for scale, both in throughput and feature size. These mask tools produce highly accurate lithographic images directly from electronic pattern files, perform multi-layer overlay, and mix-n-match across multiple tools, tool types and sites. Mask manufacturers are already accustomed to the ultimate low volume - one substrate per design layer. In order to achieve the economically required throughput, proposed ML2 systems eliminate or greatly reduce some of the functions that are the source of the mask writer's accuracy. Can these ML2 systems meet the demanding lithographic requirements without these functions? ML2 may eliminate the reticle but many of the processes and procedures performed today by the mask manufacturer are still required. Examples include the increasingly complex mask data preparation step and the verification performed to ensure that the pattern on the reticle is accurately representing the design intent. The error sources that are fixed on a reticle are variable with time on an ML2 system. It has been proposed that if ML2 is successful it will become uneconomical to be in the mask business - that ML2, by taking the high profit masks will take all profitability out of mask manufacturing and thereby endanger the entire semiconductor industry. Others suggest that a successful ML2 system solves the mask cost issue and thereby reduces the need and attractiveness of ML2. Are these concerns valid? In this paper we will present a perspective on maskless lithography from the considerable "direct write" experience of a mask manufacturer. We will examine the various business models proposed for ML2 insertion as well as the key technical challenges to achieving simultaneously the throughput and the lithographic quality necessary to become economically viable. We will consider the question of the economic viability of the mask industry in a post-ML2 world and will propose possible models where the mask industry can meaningfully participate.

The JWST/NIRCam Coronagraph: Mask Design and Fabrication

NASA Technical Reports Server (NTRS)

Krista, John E.; Balasubramanian, Kunjithapatha; Beichman, Charles A.; Echternach, Pierre M.; Green, Joseph J.; Liewer, Kurt M.; Muller, Richard E.; Serabyn, Eugene; Shaklan, Stuart B.; Trauger, John T.;

Visualization of retinal vascular structure and perfusion with a nonconfocal adaptive optics scanning light ophthalmoscope

PubMed Central

Sulai, Yusufu N.; Scoles, Drew; Harvey, Zachary; Dubra, Alfredo

2015-01-01

Imaging of the retinal vascular structure and perfusion was explored by confocal illumination and nonconfocal detection in an adaptive optics scanning light ophthalmoscope (AOSLO), as an extension of the work by Chui et al. [Biomed. Opt. Express 3, 2537 (2012)]. Five different detection schemes were evaluated at multiple retinal locations: circular mask, annular mask, circular mask with filament, knife-edge, and split-detector. Given the superior image contrast in the reflectance and perfusion maps, the split-detection method was further tested using pupil apodization, polarized detection, and four different wavelengths. None of these variations provided noticeable contrast improvement. The noninvasive visualization of capillary flow and structure provided by AOSLO split-detection shows great promise for studying ocular and systemic conditions that affect the retinal vasculature. PMID:24690655

The role of executive attention in object substitution masking.

PubMed

Filmer, Hannah L; Wells-Peris, Roxanne; Dux, Paul E

2017-05-01

It was long thought that a key characteristic of object substitution masking (OSM) was the requirement for spatial attention to be dispersed for the mask to impact visual sensitivity. However, recent studies have provided evidence questioning whether spatial attention interacts with OSM magnitude, suggesting that the previous reports reflect the impact of performance being at ceiling for the low attention load conditions. Another technique that has been employed to modulate attention in OSM paradigms involves presenting the target stimulus foveally, but with another demanding task shown immediately prior, and thus taxing executive/temporal attention. Under such conditions, when the two tasks occur in close temporal proximity relatively to greater temporal separation, masking is increased. However this effect could also be influenced by performance being at ceiling in some conditions. Here, we manipulated executive attention for a foveated target using a dual-task paradigm. Critically, ceiling performance was avoided by thresholding the target stimulus prior to it being presented under OSM conditions. We found no evidence for an interaction between executive attention load and masking. Collectively, along with the previous findings, our results provide compelling evidence that OSM as a phenomenon occurs independently of attention.

A robust threshold-based cloud mask for the HRV channel of MSG SEVIRI

NASA Astrophysics Data System (ADS)

Bley, S.; Deneke, H.

2013-03-01

A robust threshold-based cloud mask for the high-resolution visible (HRV) channel (1 × 1 km2) of the METEOSAT SEVIRI instrument is introduced and evaluated. It is based on operational EUMETSAT cloud mask for the low resolution channels of SEVIRI (3 × 3 km2), which is used for the selection of suitable thresholds to ensure consistency with its results. The aim of using the HRV channel is to resolve small-scale cloud structures which cannot be detected by the low resolution channels. We find that it is of advantage to apply thresholds relative to clear-sky reflectance composites, and to adapt the threshold regionally. Furthermore, the accuracy of the different spectral channels for thresholding and the suitability of the HRV channel are investigated for cloud detection. The case studies show different situations to demonstrate the behaviour for various surface and cloud conditions. Overall, between 4 and 24% of cloudy low-resolution SEVIRI pixels are found to contain broken clouds in our test dataset depending on considered region. Most of these broken pixels are classified as cloudy by EUMETSAT's cloud mask, which will likely result in an overestimate if the mask is used as estimate of cloud fraction.

Ringfield lithographic camera

DOEpatents

Sweatt, W.C.

1998-09-08

A projection lithography camera is presented with a wide ringfield optimized so as to make efficient use of extreme ultraviolet radiation from a large area radiation source (e.g., D{sub source} {approx_equal} 0.5 mm). The camera comprises four aspheric mirrors optically arranged on a common axis of symmetry. The camera includes an aperture stop that is accessible through a plurality of partial aperture stops to synthesize the theoretical aperture stop. Radiation from a mask is focused to form a reduced image on a wafer, relative to the mask, by reflection from the four aspheric mirrors. 11 figs.

Selective impairment of masked priming in dual-task performance.

PubMed

Fischer, Rico; Kiesel, Andrea; Kunde, Wilfried; Schubert, Torsten

2011-03-01

This study investigated the impact of divided attention on masked priming. In a dual-task setting, two tasks had to be carried out in close temporal succession: a tone discrimination task and a masked priming task. The order of the tasks was varied between experiments, and attention was always allocated to the first task-that is, the first task was prioritized. The priming task was the second (nonprioritized) task in Experiment 1 and the first (prioritized) task in Experiment 2. In both experiments, "novel" prime stimuli associated with semantic processing were essentially ineffective. However, there was intact priming by another type of prime stimuli associated with response priming. Experiment 3 showed that all these prime stimuli can reveal significant priming effects during a task-switching paradigm in which both tasks were performed consecutively. We conclude that dual-task specific interference processes (e.g., the simultaneous coordination of multiple stimulus-response rules) selectively impair priming that is assumed to rely on semantic processing.

Laser amplifier and method

DOEpatents

Backus, S.; Kapteyn, H.C.; Murnane, M.M.

1997-07-01

Laser amplifiers and methods for amplifying a laser beam are disclosed. A representative embodiment of the amplifier comprises first and second curved mirrors, a gain medium, a third mirror, and a mask. The gain medium is situated between the first and second curved mirrors at the focal point of each curved mirror. The first curved mirror directs and focuses a laser beam to pass through the gain medium to the second curved mirror which reflects and recollimates the laser beam. The gain medium amplifies and shapes the laser beam as the laser beam passes therethrough. The third mirror reflects the laser beam, reflected from the second curved mirror, so that the laser beam bypasses the gain medium and return to the first curved mirror, thereby completing a cycle of a ring traversed by the laser beam. The mask defines at least one beam-clipping aperture through which the laser beam passes during a cycle. The gain medium is pumped, preferably using a suitable pumping laser. The laser amplifier can be used to increase the energy of continuous-wave or, especially, pulsed laser beams including pulses of femtosecond duration and relatively high pulse rate. 7 figs.

Laser amplifier and method

DOEpatents

Backus, Sterling; Kapteyn, Henry C.; Murnane, Margaret M.

1997-01-01

Laser amplifiers and methods for amplifying a laser beam are disclosed. A representative embodiment of the amplifier comprises first and second curved mirrors, a gain medium, a third mirror, and a mask. The gain medium is situated between the first and second curved mirrors at the focal point of each curved mirror. The first curved mirror directs and focuses a laser beam to pass through the gain medium to the second curved mirror which reflects and recollimates the laser beam. The gain medium amplifies and shapes the laser beam as the laser beam passes therethough. The third mirror reflects the laser beam, reflected from the second curved mirror, so that the laser beam bypasses the gain medium and return to the first curved mirror, thereby completing a cycle of a ring traversed by the laser beam. The mask defines at least one beam-clipping aperture through which the laser beam passes during a cycle. The gain medium is pumped, preferably using a suitable pumping laser. The laser amplifier can be used to increase the energy of continuous-wave or, especially, pulsed laser beams including pulses of femtosecond duration and relatively high pulse rate.

Dynamic quantitative phase images of pond life, insect wings, and in vitro cell cultures

NASA Astrophysics Data System (ADS)

Creath, Katherine

2010-08-01

This paper presents images and data of live biological samples taken with a novel Linnik interference microscope. The specially designed optical system enables instantaneous and 3D video measurements of dynamic motions within and among live cells without the need for contrast agents. This "label-free", vibration insensitive imaging system enables measurement of biological objects in reflection using harmless light levels with current magnifications of 10X (NA 0.3) and 20X (NA 0.5) and wavelengths of 660 nm and 785 nm over fields of view from several hundred microns up to a millimeter. At the core of the instrument is a phasemeasurement camera (PMC) enabling simultaneous measurement of multiple interference patterns utilizing a pixelated phase mask taking advantage of the polarization properties of light. Utilizing this technology enables the creation of phase image movies in real time at video rates so that dynamic motions and volumetric changes can be tracked. Objects are placed on a reflective surface in liquid under a coverslip. Phase values are converted to optical thickness data enabling volumetric, motion and morphological studies. Data from a number of different mud puddle organisms such as paramecium, flagellates and rotifers will be presented, as will measurements of flying ant wings and cultures of human breast cancer cells. These data highlight examples of monitoring different biological processes and motions. The live presentation features 4D phase movies of these examples.

A threshold-based cloud mask for the high-resolution visible channel of Meteosat Second Generation SEVIRI

NASA Astrophysics Data System (ADS)

Bley, S.; Deneke, H.

2013-10-01

A threshold-based cloud mask for the high-resolution visible (HRV) channel (1 × 1 km2) of the Meteosat SEVIRI (Spinning Enhanced Visible and Infrared Imager) instrument is introduced and evaluated. It is based on operational EUMETSAT cloud mask for the low-resolution channels of SEVIRI (3 × 3 km2), which is used for the selection of suitable thresholds to ensure consistency with its results. The aim of using the HRV channel is to resolve small-scale cloud structures that cannot be detected by the low-resolution channels. We find that it is of advantage to apply thresholds relative to clear-sky reflectance composites, and to adapt the threshold regionally. Furthermore, the accuracy of the different spectral channels for thresholding and the suitability of the HRV channel are investigated for cloud detection. The case studies show different situations to demonstrate the behavior for various surface and cloud conditions. Overall, between 4 and 24% of cloudy low-resolution SEVIRI pixels are found to contain broken clouds in our test data set depending on considered region. Most of these broken pixels are classified as cloudy by EUMETSAT's cloud mask, which will likely result in an overestimate if the mask is used as an estimate of cloud fraction. The HRV cloud mask aims for small-scale convective sub-pixel clouds that are missed by the EUMETSAT cloud mask. The major limit of the HRV cloud mask is the minimum cloud optical thickness (COT) that can be detected. This threshold COT was found to be about 0.8 over ocean and 2 over land and is highly related to the albedo of the underlying surface.

Backward and Simultaneous Masking in Children with Grammatical Specific Language Impairment: No Simple Link between Auditory and Language Abilities

ERIC Educational Resources Information Center

Rosen, Stuart; Adlard, Alan; van der Lely, Heather K. J.

2009-01-01

Purpose: We investigated claims that specific language impairment (SLI) typically arises from nonspeech auditory deficits by measuring tone-in-noise thresholds in a relatively homogeneous SLI subgroup exhibiting a primary deficit restricted to grammar (Grammatical[G]-SLI). Method: Fourteen children (mostly teenagers) with G-SLI were compared to…

Effects of Audio-Visual Integration on the Detection of Masked Speech and Non-Speech Sounds

ERIC Educational Resources Information Center

Eramudugolla, Ranmalee; Henderson, Rachel; Mattingley, Jason B.

2011-01-01

Integration of simultaneous auditory and visual information about an event can enhance our ability to detect that event. This is particularly evident in the perception of speech, where the articulatory gestures of the speaker's lips and face can significantly improve the listener's detection and identification of the message, especially when that…

Multi-parameter fiber optic sensors based on fiber random grating

NASA Astrophysics Data System (ADS)

Xu, Yanping; Zhang, Mingjiang; Lu, Ping; Mihailov, Stephen; Bao, Xiaoyi

2017-04-01

Two novel configurations of multi-parameter fiber-optic sensing systems based on the fiber random grating are reported. The fiber random grating is fabricated through femtosecond laser induced refractive index modification over a 10cm standard telecom single mode fiber. In one configuration, the reflective spectrum of the fiber random grating is directly detected and a wavelength-division spectral cross-correlation algorithm is adopted to extract the spectral shifts for simultaneous measurement of temperature, axial strain, and surrounding refractive index. In the other configuration, a random fiber ring laser is constructed by incorporating the random feedback from the random grating. Numerous polarization-dependent spectral filters are formed along the random grating and superimposed to provide multiple lasing lines with high signal-to-noise ratio up to 40dB, which enables a high-fidelity multi-parameter sensing scheme by monitoring the spectral shifts of the lasing lines. Without the need of phase mask for fabrication and with the high physical strength, the random grating based sensors are much simpler and more compact, which could be potentially an excellent alternative for liquid medical sample sensing in biomedical and biochemical applications.

Using auditory-visual speech to probe the basis of noise-impaired consonant-vowel perception in dyslexia and auditory neuropathy

NASA Astrophysics Data System (ADS)

Ramirez, Joshua; Mann, Virginia

2005-08-01

Both dyslexics and auditory neuropathy (AN) subjects show inferior consonant-vowel (CV) perception in noise, relative to controls. To better understand these impairments, natural acoustic speech stimuli that were masked in speech-shaped noise at various intensities were presented to dyslexic, AN, and control subjects either in isolation or accompanied by visual articulatory cues. AN subjects were expected to benefit from the pairing of visual articulatory cues and auditory CV stimuli, provided that their speech perception impairment reflects a relatively peripheral auditory disorder. Assuming that dyslexia reflects a general impairment of speech processing rather than a disorder of audition, dyslexics were not expected to similarly benefit from an introduction of visual articulatory cues. The results revealed an increased effect of noise masking on the perception of isolated acoustic stimuli by both dyslexic and AN subjects. More importantly, dyslexics showed less effective use of visual articulatory cues in identifying masked speech stimuli and lower visual baseline performance relative to AN subjects and controls. Last, a significant positive correlation was found between reading ability and the ameliorating effect of visual articulatory cues on speech perception in noise. These results suggest that some reading impairments may stem from a central deficit of speech processing.

Auditory abilities of speakers who persisted, or recovered, from stuttering

PubMed Central

Howell, Peter; Davis, Stephen; Williams, Sheila M.

2006-01-01

Objective The purpose of this study was to see whether participants who persist in their stutter have poorer sensitivity in a backward masking task compared to those participants who recover from their stutter. Design The auditory sensitivity of 30 children who stutter was tested on absolute threshold, simultaneous masking, backward masking with a broadband and with a notched noise masker. The participants had been seen and diagnosed as stuttering at least 1 year before their 12th birthday. The participants were assessed again at age 12 plus to establish whether their stutter had persisted or recovered. Persistence or recovery was based on participant's, parent's and researcher's assessment and Riley's [Riley, G. D. (1994). Stuttering severity instrument for children and adults (3rd ed.). Austin, TX: Pro-Ed.] Stuttering Severity Instrument-3. Based on this assessment, 12 speakers had persisted and 18 had recovered from stuttering. Results Thresholds differed significantly between persistent and recovered groups for the broadband backward-masked stimulus (thresholds being higher for the persistent group). Conclusions Backward masking performance at teenage is one factor that distinguishes speakers who persist in their stutter from those who recover.

 Education objectives: Readers of this article should: (1) explain why auditory factors have been implicated in stuttering; (2) summarise the work that has examined whether peripheral, and/or central, hearing are problems in stuttering; (3) explain how the hearing ability of persistent and recovered stutterers may differ; (4) discuss how hearing disorders have been implicated in other language disorders. PMID:16920188

Less is more: Neural activity during very brief and clearly visible exposure to phobic stimuli.

PubMed

Siegel, Paul; Warren, Richard; Wang, Zhishun; Yang, Jie; Cohen, Don; Anderson, Jason F; Murray, Lilly; Peterson, Bradley S

2017-05-01

Research on automatic processes in fear has emphasized the provocation of fear responses rather than their attenuation. We have previously shown that the repeated presentation of feared images without conscious awareness via backward masking reduces avoidance of a live tarantula in spider-phobic participants. Herein we investigated the neural basis for these adaptive effects of masked exposure. 21 spider-phobic and 21 control participants, identified by a psychiatric interview, fear questionnaire, and approaching a live tarantula, viewed stimuli in each of three conditions: (1) very brief exposure (VBE) to masked images of spiders, severely limited awareness; (2) clearly visible exposure (CVE) to spiders, full awareness; and (3) masked images of flowers (control), severely limited awareness. Only VBE to masked spiders generated neural activity more strongly in phobic than in control participants, within subcortical fear, attention, higher-order language, and vision systems. Moreover, VBE activated regions that support fear processing in phobic participants without causing them to experience fear consciously. Counter-intuitively, CVE to the same spiders generated stronger neural activity in control rather than phobic participants within these and other systems. CVE deactivated regions supporting fear regulation and caused phobic participants to experience fear. CVE-induced activations also correlated with measures of explicit fear ratings, whereas VBE-induced activations correlated with measures of implicit fear (color-naming interference of spider words). These multiple dissociations between the effects of VBE and CVE to spiders suggest that limiting awareness of exposure to phobic stimuli through visual masking paradoxically facilitates their processing, while simultaneously minimizing the experience of fear. Hum Brain Mapp 38:2466-2481, 2017. © 2017 Wiley Periodicals, Inc. © 2017 Wiley Periodicals, Inc.

Is Suppression Just Normal Dichoptic Masking? Suprathreshold Considerations.

PubMed

Reynaud, Alexandre; Hess, Robert F

2016-10-01

Amblyopic patients have a deficit in visual acuity and contrast sensitivity in their amblyopic eye as well as suppression of the amblyopic eye input under binocular viewing conditions. In this study we wanted to assess the origin of the amblyopic suppression by studying the contrast perception of the amblyopic eye at suprathreshold levels under binocular and monocular viewing. Using a suprathreshold contrast matching task in which the reference and target stimuli were presented to different eyes either simultaneously or successively, we measured interocular contrast matching in 10 controls and 11 amblyopes (mean age 35 ± 15; 5 strabismics; 3 anisometropes; 3 mixed). This was then used as an index of the binocular balance across spatial frequency and compared against the contrast sensitivity ratio measured with the same stimuli. We observed that binocular matching becomes more imbalanced at high spatial frequency for amblyopes, compared with controls; that this imbalance did not depend in either group on whether the stimuli were presented simultaneously or successively; and that for both modes of presentation the matching balance correlates well with the interocular contrast sensitivity ratio (mean correlation coefficient of the slopes R = 0.7125). The results from our amblyopes show comparable losses of contrast perception at and above threshold under these binocular viewing conditions across a wide spatial frequency range, much stronger than that observed for our controls. This occurs under conditions in which there should be no dichoptic masking. Furthermore, the matching contrast could be well predicted by the monocular contrast sensitivity. Altogether, this suggests that amblyopic suppression cannot be explained by normal dichoptic masking but rather an attenuation of the input.

Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography

NASA Astrophysics Data System (ADS)

van Setten, Eelco; Bottiglieri, Gerardo; de Winter, Laurens; McNamara, John; Rusu, Paul; Lubkoll, Jan; Rispens, Gijsbert; van Schoot, Jan; Neumann, Jens Timo; Roesch, Matthias; Kneer, Bernhard

2017-10-01

To enable cost-effective shrink at the 3nm node and beyond, and to extend Moore's law into the next decade, ASML is developing a new high-NA EUV platform. The high-NA system is targeted to feature a numerical aperture (NA) of 0.55 to extend the single exposure resolution limit to 8nm half pitch. The system is being designed to achieve an on-product-overlay (OPO) performance well below 2nm, a high image contrast to drive down local CD errors and to obtain global CDU at sub-1nm level to be able to meet customer edge placement error (EPE) requirements for the devices of the future. EUV scanners employ reflective Bragg multi-layer mirrors in the mask and in the Projection Optics Box (POB) that is used to project the mask pattern into the photoresist on the silicon wafer. These MoSi multi-layer mirrors are tuned for maximum reflectivity, and thus productivity, at 13.5nm wavelength. The angular range of incident light for which a high reflectivity at the reticle can be obtained is limited to +/- 11o, exceeding the maximum angle occurring in current 0.33NA scanners at 4x demagnification. At 0.55NA the maximum angle at reticle level would extend up to 17o in the critical (scanning) direction and compromise the imaging performance of horizontal features severely. To circumvent this issue a novel anamorphic optics design has been introduced, which has a 4x demagnification in the X- (slit) direction and 8x demagnification in the Y- (scanning) direction as well as a central obscuration in the exit pupil. In this work we will show that the EUV high-NA anamorphic concept can successfully solve the angular reflectivity issues and provide good imaging performance in both directions. Several unique imaging challenges in comparison to the 0.33NA isomorphic baseline are being studied, such as the impact of the central obscuration in the POB and Mask-3D effects at increased NA that seem most pronounced for vertical features. These include M3D induced contrast loss and non-telecentricity. We will explore the solutions needed to mitigate these effects and to offer high quality imaging to be able to meet the required EPE performance in both orientations.

Cross-talk free selective reconstruction of individual objects from multiplexed optical field data

NASA Astrophysics Data System (ADS)

Zea, Alejandro Velez; Barrera, John Fredy; Torroba, Roberto

2018-01-01

In this paper we present a data multiplexing method for simultaneous storage in a single package composed by several optical fields of tridimensional (3D) objects, and their individual cross-talk free retrieval. Optical field data are extracted from off axis Fourier holograms, and then sampled by multiplying them with random binary masks. The resulting sampled optical fields can be used to reconstruct the original objects. Sampling causes a loss of quality that can be controlled by the number of white pixels in the binary masks and by applying a padding procedure on the optical field data. This process can be performed using a different binary mask for each optical field, and then added to form a multiplexed package. With the adequate choice of sampling and padding, we can achieve a volume reduction in the multiplexed package over the addition of all individual optical fields. Moreover, the package can be multiplied by a binary mask to select a specific optical field, and after the reconstruction procedure, the corresponding 3D object is recovered without any cross-talk. We demonstrate the effectiveness of our proposal for data compression with a comparison with discrete cosine transform filtering. Experimental results confirm the validity of our proposal.

A cloud mask methodology for high resolution remote sensing data combining information from high and medium resolution optical sensors

NASA Astrophysics Data System (ADS)

Sedano, Fernando; Kempeneers, Pieter; Strobl, Peter; Kucera, Jan; Vogt, Peter; Seebach, Lucia; San-Miguel-Ayanz, Jesús

2011-09-01

This study presents a novel cloud masking approach for high resolution remote sensing images in the context of land cover mapping. As an advantage to traditional methods, the approach does not rely on thermal bands and it is applicable to images from most high resolution earth observation remote sensing sensors. The methodology couples pixel-based seed identification and object-based region growing. The seed identification stage relies on pixel value comparison between high resolution images and cloud free composites at lower spatial resolution from almost simultaneously acquired dates. The methodology was tested taking SPOT4-HRVIR, SPOT5-HRG and IRS-LISS III as high resolution images and cloud free MODIS composites as reference images. The selected scenes included a wide range of cloud types and surface features. The resulting cloud masks were evaluated through visual comparison. They were also compared with ad-hoc independently generated cloud masks and with the automatic cloud cover assessment algorithm (ACCA). In general the results showed an agreement in detected clouds higher than 95% for clouds larger than 50 ha. The approach produced consistent results identifying and mapping clouds of different type and size over various land surfaces including natural vegetation, agriculture land, built-up areas, water bodies and snow.

Reflective optical imaging system

DOEpatents

Shafer, David R.

2000-01-01

An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements are characterized in order from object to image as convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention increases the slit dimensions associated with ringfield scanning optics, improves wafer throughput and allows higher semiconductor device density.

Reflective optical imaging method and circuit

DOEpatents

Shafer, David R.

2001-01-01

An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements are characterized in order from object to image as convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention increases the slit dimensions associated with ringfield scanning optics, improves wafer throughput and allows higher semiconductor device density.

Ringfield lithographic camera

DOEpatents

Sweatt, William C.

1998-01-01

A projection lithography camera is presented with a wide ringfield optimized so as to make efficient use of extreme ultraviolet radiation from a large area radiation source (e.g., D.sub.source .apprxeq.0.5 mm). The camera comprises four aspheric mirrors optically arranged on a common axis of symmetry with an increased etendue for the camera system. The camera includes an aperture stop that is accessible through a plurality of partial aperture stops to synthesize the theoretical aperture stop. Radiation from a mask is focused to form a reduced image on a wafer, relative to the mask, by reflection from the four aspheric mirrors.

Self-organized broadband light trapping in thin film amorphous silicon solar cells.

PubMed

Martella, C; Chiappe, D; Delli Veneri, P; Mercaldo, L V; Usatii, I; Buatier de Mongeot, F

2013-06-07

Nanostructured glass substrates endowed with high aspect ratio one-dimensional corrugations are prepared by defocused ion beam erosion through a self-organized gold (Au) stencil mask. The shielding action of the stencil mask is amplified by co-deposition of gold atoms during ion bombardment. The resulting glass nanostructures enable broadband anti-reflection functionality and at the same time ensure a high efficiency for diffuse light scattering (Haze). It is demonstrated that the patterned glass substrates exhibit a better photon harvesting than the flat glass substrate in p-i-n type thin film a-Si:H solar cells.

Photovoltaic cell and production thereof

DOEpatents

Narayanan, Srinivasamohan [Gaithersburg, MD; Kumar, Bikash [Bangalore, IN

2008-07-22

An efficient photovoltaic cell, and its process of manufacture, is disclosed wherein the back surface p-n junction is removed from a doped substrate having an oppositely doped emitter layer. A front surface and edges and optionally the back surface periphery are masked and a back surface etch is performed. The mask is not removed and acts as an anti-reflective coating, a passivating agent, or both. The photovoltaic cell retains an untextured back surface whether or not the front is textured and the dopant layer on the back surface is removed to enhance the cell efficiency. Optionally, a back surface field is formed.

Difficulty identifying feelings and automatic activation in the fusiform gyrus in response to facial emotion.

PubMed

Eichmann, Mischa; Kugel, Harald; Suslow, Thomas

2008-12-01

Difficulties in identifying and differentiating one's emotions are a central characteristic of alexithymia. In the present study, automatic activation of the fusiform gyrus to facial emotion was investigated as a function of alexithymia as assessed by the 20-item Toronto Alexithymia Scale. During 3 Tesla fMRI scanning, pictures of faces bearing sad, happy, and neutral expressions masked by neutral faces were presented to 22 healthy adults who also responded to the Toronto Alexithymia Scale. The fusiform gyrus was selected as the region of interest, and voxel values of this region were extracted, summarized as means, and tested among the different conditions (sad, happy, and neutral faces). Masked sad facial emotions were associated with greater bilateral activation of the fusiform gyrus than masked neutral faces. The subscale, Difficulty Identifying Feelings, was negatively correlated with the neural response of the fusiform gyrus to masked sad faces. The correlation results suggest that automatic hyporesponsiveness of the fusiform gyrus to negative emotion stimuli may reflect problems in recognizing one's emotions in everyday life.

Utilization of optical emission endpoint in photomask dry etch processing

NASA Astrophysics Data System (ADS)

Faure, Thomas B.; Huynh, Cuc; Lercel, Michael J.; Smith, Adam; Wagner, Thomas

2002-03-01

Use of accurate and repeatable endpoint detection during dry etch processing of photomask is very important for obtaining good mask mean-to-target and CD uniformity performance. It was found that the typical laser reflectivity endpoint detecting system used on photomask dry etch systems had several key limitations that caused unnecessary scrap and non-optimum image size performance. Consequently, work to develop and implement use of a more robust optical emission endpoint detection system for chrome dry etch processing of photomask was performed. Initial feasibility studies showed that the emission technique was sensitive enough to monitor pattern loadings on contact and via level masks down to 3 percent pattern coverage. Additional work was performed to further improve this to 1 percent pattern coverage by optimizing the endpoint detection parameters. Comparison studies of mask mean-to-target performance and CD uniformity were performed with the use of optical emission endpoint versus laser endpoint for masks built using TOK IP3600 and ZEP 7000 resist systems. It was found that an improvement in mean-to-target performance and CD uniformity was realized on several types of production masks. In addition, part-to-part endpoint time repeatability was found to be significantly improved with the use of optical emission endpoint.

Unmasking identity dissonance: exploring medical students' professional identity formation through mask making.

PubMed

Joseph, Kimera; Bader, Karlen; Wilson, Sara; Walker, Melissa; Stephens, Mark; Varpio, Lara

2017-04-01

Professional identity formation is an on-going, integrative process underlying trainees' experiences of medical education. Since each medical student's professional identity formation process is an individual, internal, and often times emotionally charged unconscious experience, it can be difficult for educators to understand each student's unique experience. We investigate if mask making can provide learners and educators the opportunity to explore medical students' professional identity formation experiences. In 2014 and 2015, 30 third year medical students created masks, with a brief accompanying written narrative, to creatively express their medical education experiences. Using a paradigmatic case selection approach, four masks were analyzed using techniques from visual rhetoric and the Listening Guide. The research team clearly detected identity dissonance in each case. Each case provided insights into the unique personal experiences of the dissonance process for each trainee at a particular point in their medical school training. We propose that mask making accompanied by a brief narrative reflection can help educators identify students experiencing identity dissonance, and explore each student's unique experience of that dissonance. The process of making these artistic expressions may also provide a form of intervention that can enable educators to help students navigate professional identity formation and identity dissonance experiences.

Imaging performance improvement of coherent extreme-ultraviolet scatterometry microscope with high-harmonic-generation extreme-ultraviolet source

NASA Astrophysics Data System (ADS)

Mamezaki, Daiki; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo

2017-06-01

In extreme-ultraviolet (EUV) lithography, the development of a review apparatus for the EUV mask pattern at an exposure wavelength of 13.5 nm is required. The EUV mask is composed of an absorber pattern and a Mo/Si multilayer on a glass substrate. This mask pattern has a three-dimensional (3D) structure. The 3D structure would modulate the EUV reflection phase, which would cause focus and pattern shifts. Thus, the review of the EUV phase image is also important. We have developed a coherent EUV scatterometry microscope (CSM), which is a simple microscope without objective optics. The EUV phase and intensity images were reconstructed with diffraction images by ptychography. For a standalone mask review, the high-harmonic-generation (HHG) EUV source was employed. In this study, we updated the sample stage, pump-laser reduction system, and gas-pressure control system to reconstruct the image. As a result, an 88 nm line-and-space pattern and a cross-line pattern were reconstructed. In addition, a particle defect of 2 µm diameter was well reconstructed. This demonstrated the high capability of the standalone CSM, which can hence be used in factories, such as mask shops and semiconductor fabrication plants.

The verification of printability about marginal defects and the detectability at the inspection tool in sub 50nm node

NASA Astrophysics Data System (ADS)

Lee, Hyemi; Jeong, Goomin; Seo, Kangjun; Kim, Sangchul; kim, changreol

2008-05-01

Since mask design rule is smaller and smaller, Defects become one of the issues dropping the mask yield. Furthermore controlled defect size become smaller while masks are manufactured. According to ITRS roadmap on 2007, controlled defect size is 46nm in 57nm node and 36nm in 45nm node on a mask. However the machine development is delayed in contrast with the speed of the photolithography development. Generally mask manufacturing process is divided into 3 parts. First part is patterning on a mask and second part is inspecting the pattern and repairing the defect on the mask. At that time, inspection tools of transmitted light type are normally used and are the most trustful as progressive type in the developed inspection tools until now. Final part is shipping the mask after the qualifying the issue points and weak points. Issue points on a mask are qualified by using the AIMS (Aerial image measurement system). But this system is including the inherent error possibility, which is AIMS measures the issue points based on the inspection results. It means defects printed on a wafer are over the specific size detected by inspection tools and the inspection tool detects the almost defects. Even though there are no tools to detect the 46nm and 36nm defects suggested by ITRS roadmap, this assumption is applied to manufacturing the 57nm and 45nm device. So we make the programmed defect mask consisted with various defect type such as spot, clear extension, dark extension and CD variation on L/S(line and space), C/H(contact hole) and Active pattern in 55nm and 45nm node. And the programmed defect mask was inspected by using the inspection tool of transmitted light type and was measured by using AIMS 45-193i. Then the marginal defects were compared between the inspection tool and AIMS. Accordingly we could verify whether defect size is proper or not, which was suggested to be controlled on a mask by ITRS roadmap. Also this result could suggest appropriate inspection tools for next generation device among the inspection tools of transmitted light type, reflected light type and aerial image type.

Remote Sensing of the Radiative and Microphysical Properties of Clouds during TC4: Results from MAS, MASTER, MODIS, and MISR

NASA Technical Reports Server (NTRS)

King, Michael D.; Platnick, Steven; Wind, Galina; Arnold, George T.; Ackerman, Steven A.; Frey, Richard

2007-01-01

The MODIS Airborne Simulator (MAS) and MODIS/ASTER Airborne Simulator (MASTER) were used to obtain measurements of the bidirectional reflectance and brightness temperature of clouds at 50 discrete wavelengths between 0.47 and 14.3 (12.9 m for MASTER). These observations were obtained from the NASA ER-2 aircraft as part of the Tropical Composition, Clouds and Climate Coupling Experiment (TC4) conducted over Central America and surrounding Pacific and Atlantic Oceans between July 17 and August 8, 2007. Multispectral images in eight distinct bands were used to derive a confidence in clear sky (or alternatively the probability of cloud) over land and ocean ecosystems. Based on the results of individual tests run as part of this cloud mask, an algorithm was developed to estimate the phase of the clouds (liquid water, ice, or undetermined phase). Finally, the cloud optical thickness and effective radius were derived for both liquid water and ice clouds that were detected during each flight, using a nearly identical algorithm as that implemented operationally to process MODIS cloud data from the Aqua and Terra satellites (Collection 5). This analysis shows that the cloud mask developed for operational use on MODIS, and tested using MAS and MASTER date in TC4, is quite capable of distinguishing both liquid water and ice clouds during daytime conditions over both land and ocean. The cloud optical thickness and effective radius retrievals used three distinct bands of the MAS (or MASTER), and these results were compared with nearly simultaneous retrievals of MODIS on the Terra spacecraft. Finally, this MODIS-based algorithm was adapted to MISR data to infer the cloud optical thickness of liquid water clouds from MISR. Results of this analysis will be presented and discussed.

Expression of the degree of polarization based on the geometrical optics pBRDF model.

PubMed

Wang, Kai; Zhu, Jingping; Liu, Hong; Du, Bingzheng

2017-02-01

An expression of the degree of polarization (DOP) based on the geometrical optics polarimetric bidirectional reflectance distribution function model is presented. In this expression, the DOP is related to the surface roughness and decreases at different reflection angles because diffuse reflection is taken into consideration. A shadowing/masking function introduced into the specular reflection expression makes the DOP values decrease as the angle of incidence or observation approaches grazing. Different kinds of materials were measured to validate the accuracy of this DOP expression. The measured results suggest that the errors of the DOP are reduced significantly, and the polarized reflection characteristics can be described more reasonably and accurately.

Availability, consistency and evidence-base of policies and guidelines on the use of mask and respirator to protect hospital health care workers: a global analysis

PubMed Central

2013-01-01

Background Currently there is an ongoing debate and limited evidence on the use of masks and respirators for the prevention of respiratory infections in health care workers (HCWs). This study aimed to examine available policies and guidelines around the use of masks and respirators in HCWs and to describe areas of consistency between guidelines, as well as gaps in the recommendations, with reference to the WHO and the CDC guidelines. Methods Policies and guidelines related to mask and respirator use for the prevention of influenza, SARS and TB were examined. Guidelines from the World Health Organization (WHO), the Center for Disease Control and Prevention (CDC), three high-income countries and six low/middle-income countries were selected. Results Uniform recommendations are made by the WHO and the CDC in regards to protecting HCWs against seasonal influenza (a mask for low risk situations and a respirator for high risk situations) and TB (use of a respirator). However, for pandemic influenza and SARS, the WHO recommends mask use in low risk and respirators in high risk situations, whereas, the CDC recommends respirators in both low and high risk situations. Amongst the nine countries reviewed, there are variations in the recommendations for all three diseases. While, some countries align with the WHO recommendations, others align with those made by the CDC. The choice of respirator and the level of filtering ability vary amongst the guidelines and the different diseases. Lastly, none of the policies discuss reuse, extended use or the use of cloth masks. Conclusion Currently, there are significant variations in the policies and recommendations around mask and respirator use for protection against influenza, SARS and TB. These differences may reflect the scarcity of level-one evidence available to inform policy development. The lack of any guidelines on the use of cloth masks, despite widespread use in many low and middle-income countries, remains a policy gap. Health organizations and countries should jointly evaluate the available evidence, prioritize research to inform evidence gaps, and develop consistent policy on masks and respirator use in the health care setting. PMID:23725338

Availability, consistency and evidence-base of policies and guidelines on the use of mask and respirator to protect hospital health care workers: a global analysis.

PubMed

Chughtai, Abrar Ahmad; Seale, Holly; MacIntyre, Chandini Raina

2013-05-31

Currently there is an ongoing debate and limited evidence on the use of masks and respirators for the prevention of respiratory infections in health care workers (HCWs). This study aimed to examine available policies and guidelines around the use of masks and respirators in HCWs and to describe areas of consistency between guidelines, as well as gaps in the recommendations, with reference to the WHO and the CDC guidelines. Policies and guidelines related to mask and respirator use for the prevention of influenza, SARS and TB were examined. Guidelines from the World Health Organization (WHO), the Center for Disease Control and Prevention (CDC), three high-income countries and six low/middle-income countries were selected. Uniform recommendations are made by the WHO and the CDC in regards to protecting HCWs against seasonal influenza (a mask for low risk situations and a respirator for high risk situations) and TB (use of a respirator). However, for pandemic influenza and SARS, the WHO recommends mask use in low risk and respirators in high risk situations, whereas, the CDC recommends respirators in both low and high risk situations. Amongst the nine countries reviewed, there are variations in the recommendations for all three diseases. While, some countries align with the WHO recommendations, others align with those made by the CDC. The choice of respirator and the level of filtering ability vary amongst the guidelines and the different diseases. Lastly, none of the policies discuss reuse, extended use or the use of cloth masks. Currently, there are significant variations in the policies and recommendations around mask and respirator use for protection against influenza, SARS and TB. These differences may reflect the scarcity of level-one evidence available to inform policy development. The lack of any guidelines on the use of cloth masks, despite widespread use in many low and middle-income countries, remains a policy gap. Health organizations and countries should jointly evaluate the available evidence, prioritize research to inform evidence gaps, and develop consistent policy on masks and respirator use in the health care setting.

Shot-noise limited throughput of soft x-ray ptychography for nanometrology applications

NASA Astrophysics Data System (ADS)

Koek, Wouter; Florijn, Bastiaan; Bäumer, Stefan; Kruidhof, Rik; Sadeghian, Hamed

2018-03-01

Due to its potential for high resolution and three-dimensional imaging, soft x-ray ptychography has received interest for nanometrology applications. We have analyzed the measurement time per unit area when using soft x-ray ptychography for various nanometrology applications including mask inspection and wafer inspection, and are thus able to predict (order of magnitude) throughput figures. Here we show that for a typical measurement system, using a typical sampling strategy, and when aiming for 10-15 nm resolution, it is expected that a wafer-based topology (2.5D) measurement takes approximately 4 minutes per μm2 , and a full three-dimensional measurement takes roughly 6 hours per μm2 . Due to their much higher reflectivity EUV masks can be measured considerably faster; a measurement speed of 0.1 seconds per μm2 is expected. However, such speeds do not allow for full wafer or mask inspection at industrially relevant throughput.

Prospects of DUV OoB suppression techniques in EUV lithography

NASA Astrophysics Data System (ADS)

Park, Chang-Min; Kim, Insung; Kim, Sang-Hyun; Kim, Dong-Wan; Hwang, Myung-Soo; Kang, Soon-Nam; Park, Cheolhong; Kim, Hyun-Woo; Yeo, Jeong-Ho; Kim, Seong-Sue

2014-04-01

Though scaling of source power is still the biggest challenge in EUV lithography (EUVL) technology era, CD and overlay controls for transistor's requirement are also precondition of adopting EUVL in mass production. Two kinds of contributors are identified as risks for CDU and Overlay: Infrared (IR) and deep ultraviolet (DUV) out of band (OOB) radiations from laser produced plasma (LPP) EUV source. IR from plasma generating CO2 laser that causes optics heating and wafer overlay error is well suppressed by introducing grating on collector to diffract IR off the optical axis and is the effect has been confirmed by operation of pre-production tool (NXE3100). EUV and DUV OOB which are reflected from mask black boarder (BB) are root causes of EUV-specific CD error at the boundaries of exposed shots which would result in the problem of CDU out of spec unless sufficiently suppressed. Therefore, control of DUV OOB reflection from the mask BB is one of the key technologies that must be developed prior to EUV mass production. In this paper, quantitative assessment on the advantage and the disadvantage of potential OOB solutions will be discussed. EUV and DUV OOB impacts on wafer CDs are measured from NXE3100 & NXE3300 experiments. Significant increase of DUV OOB impact on CD from NXE3300 compared with NXE3100 is observed. There are three ways of technology being developed to suppress DUV OOB: spectral purity filter (SPF) as a scanner solution, multi-layer etching as a solution on mask, and resist top-coating as a process solution. PROs and CONs of on-scanner, on-mask, and on-resist solution for the mass production of EUV lithography will be discussed.

Fiber-optic fringe projection with crosstalk reduction by adaptive pattern masking

NASA Astrophysics Data System (ADS)

Matthias, Steffen; Kästner, Markus; Reithmeier, Eduard

2017-02-01

To enable in-process inspection of industrial manufacturing processes, measuring devices need to fulfill time and space constraints, while also being robust to environmental conditions, such as high temperatures and electromagnetic fields. A new fringe projection profilometry system is being developed, which is capable of performing the inspection of filigree tool geometries, e.g. gearing elements with tip radii of 0.2 mm, inside forming machines of the sheet-bulk metal forming process. Compact gradient-index rod lenses with a diameter of 2 mm allow for a compact design of the sensor head, which is connected to a base unit via flexible high-resolution image fibers with a diameter of 1.7 mm. The base unit houses a flexible DMD based LED projector optimized for fiber coupling and a CMOS camera sensor. The system is capable of capturing up to 150 gray-scale patterns per second as well as high dynamic range images from multiple exposures. Owing to fiber crosstalk and light leakage in the image fiber, signal quality suffers especially when capturing 3-D data of technical surfaces with highly varying reflectance or surface angles. An algorithm is presented, which adaptively masks parts of the pattern to reduce these effects via multiple exposures. The masks for valid surface areas are automatically defined according to different parameters from an initial capture, such as intensity and surface gradient. In a second step, the masks are re-projected to projector coordinates using the mathematical model of the system. This approach is capable of reducing both inter-pixel crosstalk and inter-object reflections on concave objects while maintaining measurement durations of less than 5 s.

Fabricating interlocking support walls, with an adjustable backshort, in a TES bolometer array for far-infrared astronomy

NASA Astrophysics Data System (ADS)

Miller, Timothy M.; Abrahams, John H.; Allen, Christine A.

2006-04-01

We report a fabrication process for deep etching silicon to different depths with a single masking layer, using standard masking and exposure techniques. Using this technique, we have incorporated a deep notch in the support walls of a transition-edge-sensor (TES) bolometer array during the detector back-etch, while simultaneously creating a cavity behind the detector. The notches serve to receive the support beams of a separate component, the Backshort-Under-Grid (BUG), an array of adjustable height quarter-wave backshorts that fill the cavities behind each pixel in the detector array. The backshort spacing, set prior to securing to the detector array, can be controlled from 25 to 300 μm by adjusting only a few process steps. In addition to backshort spacing, the interlocking beams and notches provide positioning and structural support for the ˜1 mm pitch, 8×8 array. This process is being incorporated into developing a TES bolometer array with an adjustable backshort for use in far-infrared astronomy. The masking technique and machining process used to fabricate the interlocking walls will be discussed.

Informational masking and musical training

NASA Astrophysics Data System (ADS)

Oxenham, Andrew J.; Fligor, Brian J.; Mason, Christine R.; Kidd, Gerald

2003-09-01

The relationship between musical training and informational masking was studied for 24 young adult listeners with normal hearing. The listeners were divided into two groups based on musical training. In one group, the listeners had little or no musical training; the other group was comprised of highly trained, currently active musicians. The hypothesis was that musicians may be less susceptible to informational masking, which is thought to reflect central, rather than peripheral, limitations on the processing of sound. Masked thresholds were measured in two conditions, similar to those used by Kidd et al. [J. Acoust. Soc. Am. 95, 3475-3480 (1994)]. In both conditions the signal was comprised of a series of repeated tone bursts at 1 kHz. The masker was comprised of a series of multitone bursts, gated with the signal. In one condition the frequencies of the masker were selected randomly for each burst; in the other condition the masker frequencies were selected randomly for the first burst of each interval and then remained constant throughout the interval. The difference in thresholds between the two conditions was taken as a measure of informational masking. Frequency selectivity, using the notched-noise method, was also estimated in the two groups. The results showed no difference in frequency selectivity between the two groups, but showed a large and significant difference in the amount of informational masking between musically trained and untrained listeners. This informational masking task, which requires no knowledge specific to musical training (such as note or interval names) and is generally not susceptible to systematic short- or medium-term training effects, may provide a basis for further studies of analytic listening abilities in different populations.

Autonomic Nervous System Responses During Perception of Masked Speech may Reflect Constructs other than Subjective Listening Effort

PubMed Central

Francis, Alexander L.; MacPherson, Megan K.; Chandrasekaran, Bharath; Alvar, Ann M.

2016-01-01

Typically, understanding speech seems effortless and automatic. However, a variety of factors may, independently or interactively, make listening more effortful. Physiological measures may help to distinguish between the application of different cognitive mechanisms whose operation is perceived as effortful. In the present study, physiological and behavioral measures associated with task demand were collected along with behavioral measures of performance while participants listened to and repeated sentences. The goal was to measure psychophysiological reactivity associated with three degraded listening conditions, each of which differed in terms of the source of the difficulty (distortion, energetic masking, and informational masking), and therefore were expected to engage different cognitive mechanisms. These conditions were chosen to be matched for overall performance (keywords correct), and were compared to listening to unmasked speech produced by a natural voice. The three degraded conditions were: (1) Unmasked speech produced by a computer speech synthesizer, (2) Speech produced by a natural voice and masked byspeech-shaped noise and (3) Speech produced by a natural voice and masked by two-talker babble. Masked conditions were both presented at a -8 dB signal to noise ratio (SNR), a level shown in previous research to result in comparable levels of performance for these stimuli and maskers. Performance was measured in terms of proportion of key words identified correctly, and task demand or effort was quantified subjectively by self-report. Measures of psychophysiological reactivity included electrodermal (skin conductance) response frequency and amplitude, blood pulse amplitude and pulse rate. Results suggest that the two masked conditions evoked stronger psychophysiological reactivity than did the two unmasked conditions even when behavioral measures of listening performance and listeners’ subjective perception of task demand were comparable across the three degraded conditions. PMID:26973564

Surface Nanostructures Formed by Phase Separation of Metal Salt-Polymer Nanocomposite Film for Anti-reflection and Super-hydrophobic Applications

NASA Astrophysics Data System (ADS)

Con, Celal; Cui, Bo

2017-12-01

This paper describes a simple and low-cost fabrication method for multi-functional nanostructures with outstanding anti-reflective and super-hydrophobic properties. Our method employed phase separation of a metal salt-polymer nanocomposite film that leads to nanoisland formation after etching away the polymer matrix, and the metal salt island can then be utilized as a hard mask for dry etching the substrate or sublayer. Compared to many other methods for patterning metallic hard mask structures, such as the popular lift-off method, our approach involves only spin coating and thermal annealing, thus is more cost-efficient. Metal salts including aluminum nitrate nonahydrate (ANN) and chromium nitrate nonahydrate (CNN) can both be used, and high aspect ratio (1:30) and high-resolution (sub-50 nm) pillars etched into silicon can be achieved readily. With further control of the etching profile by adjusting the dry etching parameters, cone-like silicon structure with reflectivity in the visible region down to a remarkably low value of 2% was achieved. Lastly, by coating a hydrophobic surfactant layer, the pillar array demonstrated a super-hydrophobic property with an exceptionally high water contact angle of up to 165.7°.

Surface Nanostructures Formed by Phase Separation of Metal Salt-Polymer Nanocomposite Film for Anti-reflection and Super-hydrophobic Applications.

PubMed

Con, Celal; Cui, Bo

2017-12-16

This paper describes a simple and low-cost fabrication method for multi-functional nanostructures with outstanding anti-reflective and super-hydrophobic properties. Our method employed phase separation of a metal salt-polymer nanocomposite film that leads to nanoisland formation after etching away the polymer matrix, and the metal salt island can then be utilized as a hard mask for dry etching the substrate or sublayer. Compared to many other methods for patterning metallic hard mask structures, such as the popular lift-off method, our approach involves only spin coating and thermal annealing, thus is more cost-efficient. Metal salts including aluminum nitrate nonahydrate (ANN) and chromium nitrate nonahydrate (CNN) can both be used, and high aspect ratio (1:30) and high-resolution (sub-50 nm) pillars etched into silicon can be achieved readily. With further control of the etching profile by adjusting the dry etching parameters, cone-like silicon structure with reflectivity in the visible region down to a remarkably low value of 2% was achieved. Lastly, by coating a hydrophobic surfactant layer, the pillar array demonstrated a super-hydrophobic property with an exceptionally high water contact angle of up to 165.7°.

Mask face: bilateral simultaneous facial palsy in an 11-year-old boy.

PubMed

Güngör, Serdal; Güngör Raif, Sabiha; Arslan, Müjgan

2013-04-01

Bilateral facial paralysis is an uncommon clinical entity especially in the pediatric age group and occurs frequently as a manifestation of systemic disease. The most important causes are trauma, infectious diseases, neurological diseases, metabolic, neoplastic, autoimmune diseases and idiopathic disease (Bell's palsy). We report a case of an 11-year-old boy presenting with bilateral simultaneous peripheral facial paralysis. All possible infectious causes were excluded and the patient was diagnosed as having Bell's palsy (idiopathic). The most important approach in these cases is to rule out a life-threatening disease. © 2013 The Authors. Pediatrics International © 2013 Japan Pediatric Society.

Cost-effective MEMS piezoresistive cantilever-based sensor fabrication for gait movement analysis

NASA Astrophysics Data System (ADS)

Saadon, Salem; Anuar, A. F. M.; Wahab, Yufridin

2017-03-01

The conventional photolithography of crystalline silicon technique is limited to two-dimensional and structure scaling. It's also requiring a lot of time and chemical involves for the whole process. These problems can be overcome by using laser micromachining technique, that capable to produce three-dimensional structure and simultaneously avoiding the photo mask needs. In this paper, we reported on the RapidX-250 Excimer laser micromachining with 248 nm KrF to create in-time mask design and assisting in the fabrication process of piezo-resistive micro cantilever structures. Firstly, laser micromachining parameters have been investigated in order to fabricate the acceleration sensor to analyzing human gait movement. Preliminary result shows that the fabricated sensor able to define the movement difference of human motion regarding the electrical characteristic of piezo-resistor.

Reducing the substrate dependent scanner leveling effect in low-k1 contact printing

NASA Astrophysics Data System (ADS)

Chang, C. S.; Tseng, C. F.; Huang, C. H.; Yang, Elvis; Yang, T. H.; Chen, K. C.

2015-03-01

As the scaling down of design rule for high-density memory device, the small depth of focus (DoF) budget may be deteriorated by focus leveling errors, which arises in unpredicted reflectivity from multilayer structures on the topographic wafer. The leveling sensors of ASML scanner use near infrared (NIR) range wavelength which can penetrate through most of films using in semiconductor fabrication such as photo-resist, bottom anti reflective coating (BARC) and dielectric materials. Consequently, the reflected light from underlying substructures would disturb leveling sensors from accurate leveling. The different pattern densities and layout characteristics between array and periphery of a memory chip are expected to result in different leveling signals. Furthermore, the process dependent variations between wafer central and edge areas are also considered to yield different leveling performances during wafer exposure. In this study, lower blind contact immunity was observed for peripheral contacts comparing to the array contacts especially around wafer edge region. In order to overcome this problem, a series of investigations have been carried out. The wafer edge leveling optimization through circuit dependent focus edge clearance (CDFEC) option doesn't get improvement. Air gauge improved process leveling (AGILE) function of ASML immersion scanner doesn't show improved result either. The ILD uniformity improvement and step height treatments around wafer edge such as edge exclusion of film deposition and bevel etching are also ineffective to mitigate the blind contact problem of peripheral patterns. Altering the etch hard-mask stack is finally found to be an effective approach to alleviate the issue. For instance, through either containing high temperature deposition advanced patterning film (APF) in the hard-mask or inserting higher opaque film such as amorphous Si in between the hard-mask stack.

Analysis of public responses to preparedness policies: the cases of H1N1 influenza vaccination and gas mask distribution

PubMed Central

2013-01-01

Background During several months in 2009–2010, the Israeli population was asked to take part in two preparedness programs: Acquisition of gas masks against a potential chemical-warfare attack, and vaccination against the A/H1N1 influenza pandemics. Compliance with the first request was moderate and did not attract much attention, whereas compliance with the second request was very low and was accompanied by significant controversy. The aims of this study are to compare the public’s attitudes towards these two preparedness campaigns, and to explore the roles of trust, reasoned assessment, and reflexive reactions in the public’s response to governmental preparedness policies. Methods The comparative analysis was based on a telephone survey of 2,018 respondents representing a cross-section of the adult Israeli population. Univariate analysis to describe associations of public response and attitude was performed by Chi-square tests. Findings A set of queries related to actual compliance, trust in credibility of authorities, personal opinions, reasons for non-compliance, and attitudes towards uncertainties was used to characterize the response to mask-acquisition and vaccination. In the case of mask-acquisition, the dominant response profile was of trusting compliance based on non-conditional belief in the need to adhere to the recommendation (35.6% of respondents). In the case of vaccination, the dominant response profile was of trusting non-compliance based on a reflective belief in the need for adherence (34.8% of respondents). Among the variables examined in the study, passivity was found to be the major reason for non-compliance with mask-acquisition, whereas reasoned assessment of risk played a major role in non-compliance with vaccination. Realization of the complexity in dealing with uncertainty related to developing epidemics and to newly-developed vaccines was identified in the public’s response to the H1N1 vaccination campaign. Conclusions The newly identified profile of “trusting-reflective-non-complier” individuals should be of concern to policy makers. The public is not accepting governmental recommendations in an unconditional manner. This is not driven by lack of trust in authorities, but rather by the perception of the responsibility of individuals in confronting forthcoming risks. Nevertheless, under certain conditions the public may respond in a non-reflective way and delegate this responsibly to authorities in an uncontested manner. This leaves the policy makers with the complex challenge of interacting with a passive non-involved public or alternatively with an opinionated, reflexive public. PMID:23537171

From Managerialism to Communicative Competence: Control and Consensus in Educational Administration.

ERIC Educational Resources Information Center

Watkins, Peter

1986-01-01

Traditional approaches to educational administration have generally reflected a managerial perspective based partly on scientific management principles developed by Frederick W. Taylor. Concerns with efficiency and administrative control have masked inequities and ideologies comprising organizational structure. Habermas's critique may help expose…

Ultrafast laser direct hard-mask writing for high efficiency c-Si texture designs

NASA Astrophysics Data System (ADS)

Kumar, Kitty; Lee, Kenneth K. C.; Nogami, Jun; Herman, Peter R.; Kherani, Nazir P.

2013-03-01

This study reports a high-resolution hard-mask laser writing technique to facilitate the selective etching of crystalline silicon (c-Si) into an inverted-pyramidal texture with feature size and periodicity on the order of the wavelength which, thus, provides for both anti-reflection and effective light-trapping of infrared and visible light. The process also enables engineered positional placement of the inverted-pyramid thereby providing another parameter for optimal design of an optically efficient pattern. The proposed technique, a non-cleanroom process, is scalable for large area micro-fabrication of high-efficiency thin c-Si photovoltaics. Optical wave simulations suggest the fabricated textured surface with 1.3 μm inverted-pyramids and a single anti-reflective coating increases the relative energy conversion efficiency by 11% compared to the PERL-cell texture with 9 μm inverted pyramids on a 400 μm thick wafer. This efficiency gain is anticipated to improve further for thinner wafers due to enhanced diffractive light trapping effects.

Ka-Band ARM Zenith Radar Corrections Value-Added Product

DOE Office of Scientific and Technical Information (OSTI.GOV)

Johnson, Karen; Toto, Tami; Giangrande, Scott

The KAZRCOR Value -added Product (VAP) performs several corrections to the ingested KAZR moments and also creates a significant detection mask for each radar mode. The VAP computes gaseous attenuation as a function of time and radial distance from the radar antenna, based on ambient meteorological observations, and corrects observed reflectivities for that effect. KAZRCOR also dealiases mean Doppler velocities to correct velocities whose magnitudes exceed the radar’s Nyquist velocity. Input KAZR data fields are passed through into the KAZRCOR output files, in their native time and range coordinates. Complementary corrected reflectivity and velocity fields are provided, along with amore » mask of significant detections and a number of data quality flags. This report covers the KAZRCOR VAP as applied to the original KAZR radars and the upgraded KAZR2 radars. Currently there are two separate code bases for the different radar versions, but once KAZR and KAZR2 data formats are harmonized, only a single code base will be required.« less

Learning, worsening, and generalization in response to auditory perceptual training during adolescencea

PubMed Central

Huyck, Julia Jones; Wright, Beverly A.

2013-01-01

While it is commonly held that the capacity to learn is greatest in the young, there have been few direct comparisons of the response to training across age groups. Here, adolescents (11–17 years, n = 20) and adults (≥18 years, n = 11) practiced detecting a backward-masked tone for ∼1 h/day for 10 days. Nearly every adult, but only half of the adolescents improved across sessions, and the adolescents who learned did so more slowly than adults. Nevertheless, the adolescent and adult learners showed the same generalization pattern, improving on untrained backward- but not forward- or simultaneous-masking conditions. Another subset of adolescents (n = 6) actually got worse on the trained condition. This worsening, unlike learning, generalized to an untrained forward-masking, but not backward-masking condition. Within sessions, both age groups got worse, but the worsening was greater for adolescents. These maturational changes in the response to training largely followed those previously reported for temporal-interval discrimination. Overall, the results suggest that late-maturing processes affect the response to perceptual training and that some of these processes may be shared between tasks. Further, the different developmental rates for learning and generalization, and different generalization patterns for learning and worsening imply that learning, generalization, and worsening may have different origins. PMID:23927116

Accounting for nonmonotonic precursor duration effects with gain reduction in the temporal window model.

PubMed

Roverud, Elin; Strickland, Elizabeth A

2014-03-01

The mechanisms of forward masking are not clearly understood. The temporal window model (TWM) proposes that masking occurs via a neural mechanism that integrates within a temporal window. The medial olivocochlear reflex (MOCR), a sound-evoked reflex that reduces cochlear amplifier gain, may also contribute to forward masking if the preceding sound reduces gain for the signal. Psychophysical evidence of gain reduction can be observed using a growth of masking (GOM) paradigm with an off-frequency forward masker and a precursor. The basilar membrane input/output (I/O) function is estimated from the GOM function, and the I/O function gain is reduced by the precursor. In this study, the effect of precursor duration on this gain reduction effect was examined for on- and off-frequency precursors. With on-frequency precursors, thresholds increased with increasing precursor duration, then decreased (rolled over) for longer durations. Thresholds with off-frequency precursors continued to increase with increasing precursor duration. These results are not consistent with solely neural masking, but may reflect gain reduction that selectively affects on-frequency stimuli. The TWM was modified to include history-dependent gain reduction to simulate the MOCR, called the temporal window model-gain reduction (TWM-GR). The TWM-GR predicted rollover and the differences with on- and off-frequency precursors whereas the TWM did not.

Extracting Archaeological Feautres from GPR Surveys Conducted with Variable Soil Moisture Conditions

NASA Astrophysics Data System (ADS)

Morris, I. M.; Glisic, B.; Gonciar, A.

2017-12-01

As a common tool for subsurface archaeological prospection, ground penetrating radar (GPR) is a useful method for increasing the efficiency of archaeological excavations. Archaeological sites are often temporally and financially constrained, therefore having limited ability to reschedule surveys compromised by weather. Furthermore, electromagnetic GPR surveys are especially sensitive to variations in water content, soil type, and site-specific interference. In this work, GPR scans of a partially excavated Roman villa consisting of different construction materials and phases (limestone, andesite, brick) in central Romania are compared. Surveys were conducted with a 500 MHz GPR antenna in both dry (pre-rain event) and wet (post-rain event) conditions. Especially in time or depth slices, wet surveys present additional archaeological features that are not present or clear in the standard dry conditions, while simultaneously masking the clutter present in those scans. When dry, the limestone has a similar dielectric constant to the soil and does not provide enough contrast in electromagnetic properties for strong reflections despite the significant difference in their physical properties. Following precipitation, however, the electromagnetic properties of these two materials is dominated by their respective water content and the contrast is enhanced. For this reason, the wet surveys are particularly necessary for revealing reflections from the limestone features often invisible in dry surveys. GPR surveys conducted in variable environmental conditions provide unique archaeological information, with potential near-surface geophysical applications in nondestructive material characterization and identification.

Psychometric functions for informational masking

NASA Astrophysics Data System (ADS)

Lutfi, Robert A.; Kistler, Doris J.; Callahan, Michael R.; Wightman, Frederic L.

2003-04-01

The method of constant stimuli was used to obtain complete psychometric functions (PFs) from 44 normal-hearing listeners in conditions known to produce varying amounts of informational masking. The task was to detect a pure-tone signal in the presence of a broadband noise and in the presence of multitone maskers with frequencies and amplitudes that varied at random from one presentation to the next. Relative to the broadband noise condition, significant reductions were observed in both the slope and the upper asymptote of the PF for multitone maskers producing large amounts of informational masking. Slope was affected more for some listeners while asymptote was affected more for others. Mean slopes and asymptotes varied nonmonotonically with the number of masker components in much the same manner as mean thresholds. The results are consistent with a model that assumes trial-by-trial judgments are based on a weighted sum of dB levels at the output of independent auditory filters. For many listeners, however, the weights appear to reflect how often a nonsignal auditory filter is mistaken for the signal filter. For these listeners adaptive procedures may produce a significant bias in the estimates of threshold for conditions of informational masking. [Work supported by NIDCD.

Automatic emotion processing as a function of trait emotional awareness: an fMRI study

PubMed Central

Lichev, Vladimir; Sacher, Julia; Ihme, Klas; Rosenberg, Nicole; Quirin, Markus; Lepsien, Jöran; Pampel, André; Rufer, Michael; Grabe, Hans-Jörgen; Kugel, Harald; Kersting, Anette; Villringer, Arno; Lane, Richard D.

2015-01-01

It is unclear whether reflective awareness of emotions is related to extent and intensity of implicit affective reactions. This study is the first to investigate automatic brain reactivity to emotional stimuli as a function of trait emotional awareness. To assess emotional awareness the Levels of Emotional Awareness Scale (LEAS) was administered. During scanning, masked happy, angry, fearful and neutral facial expressions were presented to 46 healthy subjects, who had to rate the fit between artificial and emotional words. The rating procedure allowed assessment of shifts in implicit affectivity due to emotion faces. Trait emotional awareness was associated with increased activation in the primary somatosensory cortex, inferior parietal lobule, anterior cingulate gyrus, middle frontal and cerebellar areas, thalamus, putamen and amygdala in response to masked happy faces. LEAS correlated positively with shifts in implicit affect caused by masked happy faces. According to our findings, people with high emotional awareness show stronger affective reactivity and more activation in brain areas involved in emotion processing and simulation during the perception of masked happy facial expression than people with low emotional awareness. High emotional awareness appears to be characterized by an enhanced positive affective resonance to others at an automatic processing level. PMID:25140051

Dissociable brain mechanisms underlying the conscious and unconscious control of behavior.

PubMed

van Gaal, Simon; Lamme, Victor A F; Fahrenfort, Johannes J; Ridderinkhof, K Richard

2011-01-01

Cognitive control allows humans to overrule and inhibit habitual responses to optimize performance in challenging situations. Contradicting traditional views, recent studies suggest that cognitive control processes can be initiated unconsciously. To further capture the relation between consciousness and cognitive control, we studied the dynamics of inhibitory control processes when triggered consciously versus unconsciously in a modified version of the stop task. Attempts to inhibit an imminent response were often successful after unmasked (visible) stop signals. Masked (invisible) stop signals rarely succeeded in instigating overt inhibition but did trigger slowing down of response times. Masked stop signals elicited a sequence of distinct ERP components that were also observed on unmasked stop signals. The N2 component correlated with the efficiency of inhibitory control when elicited by unmasked stop signals and with the magnitude of slowdown when elicited by masked stop signals. Thus, the N2 likely reflects the initiation of inhibitory control, irrespective of conscious awareness. The P3 component was much reduced in amplitude and duration on masked versus unmasked stop trials. These patterns of differences and similarities between conscious and unconscious cognitive control processes are discussed in a framework that differentiates between feedforward and feedback connections in yielding conscious experience.

Maternal reflective functioning among mothers with childhood maltreatment histories: links to sensitive parenting and infant attachment security.

PubMed

Stacks, Ann M; Muzik, Maria; Wong, Kristyn; Beeghly, Marjorie; Huth-Bocks, Alissa; Irwin, Jessica L; Rosenblum, Katherine L

2014-01-01

This study examined relationships among maternal reflective functioning, parenting, infant attachment, and demographic risk in a relatively large (N = 83) socioeconomically diverse sample of women with and without a history of childhood maltreatment and their infants. Most prior research on parental reflective functioning has utilized small homogenous samples. Reflective functioning was assessed with the Parent Development Interview, parenting was coded from videotaped mother-child interactions, and infant attachment was evaluated in Ainsworth's Strange Situation by independent teams of reliable coders masked to maternal history. Reflective functioning was associated with parenting sensitivity and secure attachment, and inversely associated with demographic risk and parenting negativity; however, it was not associated with maternal maltreatment history or PTSD. Parenting sensitivity mediated the relationship between reflective functioning and infant attachment, controlling for demographic risk. Findings are discussed in the context of prior research on reflective functioning and the importance of targeting reflective functioning in interventions.

Extending CO2 cryogenic aerosol cleaning for advanced optical and EUV mask cleaning

NASA Astrophysics Data System (ADS)

Varghese, Ivin; Bowers, Charles W.; Balooch, Mehdi

2011-11-01

Cryogenic CO2 aerosol cleaning being a dry, chemically-inert and residue-free process is used in the production of optical lithography masks. It is an attractive cleaning option for the mask industry to achieve the requirement for removal of all printable soft defects and repair debris down to the 50nm printability specification. In the technique, CO2 clusters are formed by sudden expansion of liquid from high to almost atmospheric pressure through an optimally designed nozzle orifice. They are then directed on to the soft defects or debris for momentum transfer and subsequent damage free removal from the mask substrate. Unlike aggressive acid based wet cleaning, there is no degradation of the mask after processing with CO2, i.e., no critical dimension (CD) change, no transmission/phase losses, or chemical residue that leads to haze formation. Therefore no restriction on number of cleaning cycles is required to be imposed, unlike other cleaning methods. CO2 aerosol cleaning has been implemented for several years as full mask final clean in production environments at several state of the art mask shops. Over the last two years our group reported successful removal of all soft defects without damage to the fragile SRAF features, zero adders (from the cleaning and handling mechanisms) down to a 50nm printability specification. In addition, CO2 aerosol cleaning is being utilized to remove debris from Post-RAVE repair of hard defects in order to achieve the goal of no printable defects. It is expected that CO2 aerosol cleaning can be extended to extreme ultraviolet (EUV) masks. In this paper, we report advances being made in nozzle design qualification for optimum snow properties (size, velocity and flux) using Phase Doppler Anemometry (PDA) technique. In addition the two new areas of focus for CO2 aerosol cleaning i.e. pellicle glue residue removal on optical masks, and ruthenium (Ru) film on EUV masks are presented. Usually, the residue left over after the pellicle has been removed from returned masks (after long term usage/exposure in the wafer fab), requires a very aggressive SPM wet clean, that drastically reduces the available budget for mask properties (CD, phase/transmission). We show that CO2aerosol cleaning can be utilized to remove the bulk of the glue residue effectively, while preserving the mask properties. This application required a differently designed nozzle to impart the required removal force for the sticky glue residue. A new nozzle was developed and qualified that resulted in PRE in the range of 92-98%. Results also include data on a patterned mask that was exposed in a lithography stepper in a wafer production environment. On EUV mask, our group has experimentally demonstrated that 50 CO2 cleaning cycles of Ru film on the EUV Front-side resulted in no appreciable reflectivity change, implying that no degradation of the Ru film occurs.

A System for Reflective Learning Using Handwriting Tablet Devices for Real-Time Event Bookmarking into Simultaneously Recorded Videos

ERIC Educational Resources Information Center

Nakajima, Taira

2012-01-01

The author demonstrates a new system useful for reflective learning. Our new system offers an environment that one can use handwriting tablet devices to bookmark symbolic and descriptive feedbacks into simultaneously recorded videos in the environment. If one uses video recording and feedback check sheets in reflective learning sessions, one can…

Extrinsic grouping factors in motion-induced blindness

PubMed Central

2018-01-01

We investigated how various grouping factors altered subjective disappearances of the individual targets in the motion-induced blindness display. The latter relies on a moving mask to render highly salient static targets temporarily subjectively invisible. Specifically, we employed two extrinsic grouping factors, the connectedness and the common region, and examined whether their presence would make targets more resilient against the suppression. In addition, we investigated whether the presence of an illusory Kanizsa triangle would affect the suppression of the inducing Pac-Man elements. We quantified the perceptual dynamics using the proportion of the disappearance time (this indicates whether targets became more resilient against the suppression), and the proportion of simultaneous disappearance and reappearance events (characterizes the tendency for the targets to disappear or reappear as a group). We report that a single mask that encompassed all targets (a common region grouping) significantly increased the proportion of simultaneous disappearance and reappearance events, but had no effect on the proportion of the disappearance time. In contrast, a line that connected two targets significantly decreased the total invisibility time, but had no impact on the simultaneity of the disappearance and reappearance events. We found no statistically significant effect of the presence of the illusory Kanizsa triangle on either measure. Finally, we found no interaction either between the common region and the connectedness or between the common region and the presence of the illusory Kanizsa triangle. Our results indicate that extrinsic grouping factors might influence the perception differently than the intrinsic ones and highlight the importance of using several measures to characterize the perceptual dynamics, as various grouping factors might affect it differentially. PMID:29381747

Binaural electric-acoustic interactions recorded from the inferior colliculus of Guinea pigs: the effect of masking observed in the central nucleus of the inferior colliculus.

PubMed

Noh, Heil; Lee, Dong-Hee

2012-09-01

To investigate the electric-acoustic interactions within the inferior colliculus of guinea pigs and to observe how central masking appears in invasive neural recordings of the inferior colliculus (IC). A platinum-iridium wire was inserted to scala tympani through cochleostomy with a depth no greater than 1 mm for intracochlear stimulation of electric pulse train. A 5 mm 100 µm, single-shank, thin-film, penetrating recording probe was inserted perpendicularly to the surface of the IC in the coronal plane at an angle of 30-40° off the parasagittal plane with a depth of 2.0-2.5 mm. The peripheral and central masking effects were compared using electric pulse trains to the left ear and acoustic noise to the left ear (ipsilateral) and to the right ear (contralateral). Binaural acoustic stimuli were presented with different time delays and compared with combined electric and acoustic stimuli. The averaged evoked potentials and total spike numbers were measured using thin-film electrodes inserted into the central nucleus of the IC. Ipsilateral noise had more obvious effects on the electric response than did contralateral noise. Contralateral noise decreased slightly the response amplitude to the electric pulse train stimuli. Immediately after the onset of acoustic noise, the response pattern changed transiently with shorter response intervals. The effects of contralateral noise were evident at the beginning of the continuous noise. The total spike number decreased when the binaural stimuli reached the IC most simultaneously. These results suggest that central masking is quite different from peripheral masking and occurs within the binaural auditory system, and this study showed that the effect of masking could be observed in the IC recording. These effects are more evident and consistent with the psychophysical data from spike number analyses than with the previously reported gross potential data.

A Re-examination of the Effect of Masker Phase Curvature on Non-simultaneous Masking.

PubMed

Carlyon, Robert P; Flanagan, Sheila; Deeks, John M

2017-12-01

Forward masking of a sinusoidal signal is determined not only by the masker's power spectrum but also by its phase spectrum. Specifically, when the phase spectrum is such that the output of an auditory filter centred on the signal has a highly modulated ("peaked") envelope, there is less masking than when that envelope is flat. This finding has been attributed to non-linearities, such as compression, reducing the average neural response to maskers that produce more peaked auditory filter outputs (Carlyon and Datta, J Acoust Soc Am 101:3636-3647, 1997). Here we evaluate an alternative explanation proposed by Wotcjzak and Oxenham (Wojtczak and Oxenham, J Assoc Res Otolaryngol 10:595-607, 2009). They reported a masker phase effect for 6-kHz signals when the masker components were at least an octave below the signal frequency. Wotcjzak and Oxenham argued that this effect was inconsistent with cochlear compression, and, because it did not occur at lower signal frequencies, was also inconsistent with more central compression. It was instead attributed to activation of the efferent system reducing the response to the subsequent probe. Here, experiment 1 replicated their main findings. Experiment 2 showed that the phase effect on off-frequency forward masking is similar at signal frequencies of 2 and 6 kHz, provided that one equates the number of components likely to interact within an auditory filter centred on the signal, thereby roughly equating the effect of masker phase on the peakiness of that filter output. Experiment 3 showed that for some subjects, masker phase also had a strong influence on off-frequency backward masking of the signal, and that the size of this effect correlated across subjects with that observed in forward masking. We conclude that the masker phase effect is mediated mainly by cochlear non-linearities, with a possible additional effect of more central compression. The data are not consistent with a role for the efferent system.

A masking level difference due to harmonicity.

PubMed

Treurniet, W C; Boucher, D R

2001-01-01

The role of harmonicity in masking was studied by comparing the effect of harmonic and inharmonic maskers on the masked thresholds of noise probes using a three-alternative, forced-choice method. Harmonic maskers were created by selecting sets of partials from a harmonic series with an 88-Hz fundamental and 45 consecutive partials. Inharmonic maskers differed in that the partial frequencies were perturbed to nearby values that were not integer multiples of the fundamental frequency. Average simultaneous-masked thresholds were as much as 10 dB lower with the harmonic masker than with the inharmonic masker, and this difference was unaffected by masker level. It was reduced or eliminated when the harmonic partials were separated by more than 176 Hz, suggesting that the effect is related to the extent to which the harmonics are resolved by auditory filters. The threshold difference was not observed in a forward-masking experiment. Finally, an across-channel mechanism was implicated when the threshold difference was found between a harmonic masker flanked by harmonic bands and a harmonic masker flanked by inharmonic bands. A model developed to explain the observed difference recognizes that an auditory filter output envelope is modulated when the filter passes two or more sinusoids, and that the modulation rate depends on the differences among the input frequencies. For a harmonic masker, the frequency differences of adjacent partials are identical, and all auditory filters have the same dominant modulation rate. For an inharmonic masker, however, the frequency differences are not constant and the envelope modulation rate varies across filters. The model proposes that a lower variability facilitates detection of a probe-induced change in the variability, thus accounting for the masked threshold difference. The model was supported by significantly improved predictions of observed thresholds when the predictor variables included envelope modulation rate variance measured using simulated auditory filters.

Setting Thresholds to Varying Blood Pressure Monitoring Intervals Differentially Affects Risk Estimates Associated With White-Coat and Masked Hypertension in the Population

PubMed Central

Asayama, Kei; Thijs, Lutgarde; Li, Yan; Gu, Yu-Mei; Hara, Azusa; Liu, Yan-Ping; Zhang, Zhenyu; Wei, Fang-Fei; Lujambio, Inés; Mena, Luis J.; Boggia, José; Hansen, Tine W.; Björklund-Bodegård, Kristina; Nomura, Kyoko; Ohkubo, Takayoshi; Jeppesen, Jørgen; Torp-Pedersen, Christian; Dolan, Eamon; Stolarz-Skrzypek, Katarzyna; Malyutina, Sofia; Casiglia, Edoardo; Nikitin, Yuri; Lind, Lars; Luzardo, Leonella; Kawecka-Jaszcz, Kalina; Sandoya, Edgardo; Filipovský, Jan; Maestre, Gladys E.; Wang, Jiguang; Imai, Yutaka; Franklin, Stanley S.; O’Brien, Eoin; Staessen, Jan A.

2015-01-01

Outcome-driven recommendations about time intervals during which ambulatory blood pressure should be measured to diagnose white-coat or masked hypertension are lacking. We cross-classified 8237 untreated participants (mean age, 50.7 years; 48.4% women) enrolled in 12 population studies, using ≥140/≥90, ≥130/≥80, ≥135/≥85, and ≥120/≥70 mm Hg as hypertension thresholds for conventional, 24-hour, daytime, and nighttime blood pressure. White-coat hypertension was hypertension on conventional measurement with ambulatory normotension, the opposite condition being masked hypertension. Intervals used for classification of participants were daytime, nighttime, and 24 hours, first considered separately, and next combined as 24 hours plus daytime or plus nighttime, or plus both. Depending on time intervals chosen, white-coat and masked hypertension frequencies ranged from 6.3% to 12.5% and from 9.7% to 19.6%, respectively. During 91 046 person-years, 729 participants experienced a cardiovascular event. In multivariable analyses with normotension during all intervals of the day as reference, hazard ratios associated with white-coat hypertension progressively weakened considering daytime only (1.38; P=0.033), nighttime only (1.43; P=0.0074), 24 hours only (1.21; P=0.20), 24 hours plus daytime (1.24; P=0.18), 24 hours plus nighttime (1.15; P=0.39), and 24 hours plus daytime and nighttime (1.16; P=0.41). The hazard ratios comparing masked hypertension with normotension were all significant (P<0.0001), ranging from 1.76 to 2.03. In conclusion, identification of truly low-risk white-coat hypertension requires setting thresholds simultaneously to 24 hours, daytime, and nighttime blood pressure. Although any time interval suffices to diagnose masked hypertension, as proposed in current guidelines, full 24-hour recordings remain standard in clinical practice. PMID:25135185

Fabrication of wedged multilayer Laue lenses

DOE PAGES

Prasciolu, M.; Leontowich, A. F. G.; Krzywinski, J.; ...

2015-01-01

We present a new method to fabricate wedged multilayer Laue lenses, in which the angle of diffracting layers smoothly varies in the lens to achieve optimum diffracting efficiency across the entire pupil of the lens. This was achieved by depositing a multilayer onto a flat substrate placed in the penumbra of a straight-edge mask. The distance between the mask and the substrate was calibrated and the multilayer Laue lens was cut in a position where the varying layer thickness and the varying layer tilt simultaneously satisfy the Fresnel zone plate condition and Bragg’s law for all layers in the stack.more » This method can be used to extend the achievable numerical aperture of multilayer Laue lenses to reach considerably smaller focal spot sizes than achievable with lenses composed of parallel layers.« less

Simultaneous occurrence of multiple aetiologies of polycythaemia: renal cell carcinoma, sleep apnoea syndrome, and relative polycythaemia in a smoker with masked polycythaemia rubra vera

PubMed Central

Shih, L.; Wang, M.; Fu, J.

2000-01-01

A 58 year old male heavy smoker presented with intracranial haemorrhage and erythrocytosis. Four aetiologies of polycythaemia—polycythaemia rubra vera (PRV), renal cell carcinoma, sleep apnoea syndrome, and relative polycythaemia—were found to be associated with the underlying causes of erythrocytosis. He did not fulfill the diagnostic criteria for PRV at initial presentation, but an erythropoietin independent erythroid progenitor assay identified the masked PRV, and the low post-phlebotomy erythropoietin concentration also suggested the likelihood of PRV evolution. This case demonstrates that a search for all the possible causes of erythrocytosis is warranted in patients who already have one aetiology of polycythaemia. Key Words: erythrocytosis • polycythaemia rubra vera • renal cell carcinoma • sleep apnoea syndrome • relative polycythaemia • endogenous erythroid colony PMID:10961184

Ambulatory blood pressure and arterial stiffness in individuals with type 1 diabetes.

PubMed

Lithovius, Raija; Gordin, Daniel; Forsblom, Carol; Saraheimo, Markku; Harjutsalo, Valma; Groop, Per-Henrik

2018-05-24

This study aimed to assess the use of ambulatory BP monitoring (ABPM) to identify the presence of masked, nocturnal and white-coat hypertension in individuals with type 1 diabetes, patterns that could not be detected by regular office-based BP monitoring alone. We also analysed associations between BP patterns and arterial stiffness in order to identify individuals at cardiovascular risk. This substudy included 140 individuals with type 1 diabetes from the Helsinki metropolitan area, who attended the Finnish Diabetic Nephropathy Study (FinnDiane) Centre in Helsinki between January 2013 and August 2017. Twenty-four hour ABPM and pulse wave analysis were performed simultaneously using a validated non-invasive brachial oscillometric device (Mobil-O-Graph). Definitions of hypertension were based on the European Society of Hypertension guidelines. Masked hypertension was defined as normal office BP (BP obtained using a standardised automated BP device) but elevated 24 h ABPM, and white-coat hypertension as elevated office BP but normal 24 h ABPM. A total of 38% of individuals were normotensive and 33% had sustained hypertension, while 23% had masked and 6% had white-coat hypertension. About half of the cohort had increased absolute levels of night-time BP, half of whom were untreated. In the ambulatory setting, central BP and pulse wave velocity (PWV) were higher in participants with masked hypertension than in those with normotension (p ≤ 0.001). In a multivariable linear regression model adjusted for age, sex, BMI, antihypertensive treatment and eGFR, masked hypertension was independently associated with higher 24 h PWV (β 0.50 [95% CI 0.34, 0.66]), but not with PWV obtained during resting conditions (adjusted β 0.28 [95% CI -0.53, 1.10]), using normotension as the reference group. ABPM analysis revealed that one-quarter of the participants with type 1 diabetes had masked hypertension; these individuals would not have been detected by office BP alone. Moreover, arterial stiffness was increased in individuals with masked hypertension. These findings support the use of ABPM to identify individuals at risk of cardiovascular disease.

Single-cell multimodal profiling reveals cellular epigenetic heterogeneity.

PubMed

Cheow, Lih Feng; Courtois, Elise T; Tan, Yuliana; Viswanathan, Ramya; Xing, Qiaorui; Tan, Rui Zhen; Tan, Daniel S W; Robson, Paul; Loh, Yuin-Han; Quake, Stephen R; Burkholder, William F

2016-10-01

Sample heterogeneity often masks DNA methylation signatures in subpopulations of cells. Here, we present a method to genotype single cells while simultaneously interrogating gene expression and DNA methylation at multiple loci. We used this targeted multimodal approach, implemented on an automated, high-throughput microfluidic platform, to assess primary lung adenocarcinomas and human fibroblasts undergoing reprogramming by profiling epigenetic variation among cell types identified through genotyping and transcriptional analysis.

Hearing Sensitivity to Shifts of Rippled-Spectrum Sound Signals in Masking Noise.

PubMed

Nechaev, Dmitry I; Milekhina, Olga N; Supin, Alexander Ya

2015-01-01

The goal of the study was to enlarge knowledge of discrimination of complex sound signals by the auditory system in masking noise. For that, influence of masking noise on detection of shift of rippled spectrum was studied in normal listeners. The signal was a shift of ripple phase within a 0.5-oct wide rippled spectrum centered at 2 kHz. The ripples were frequency-proportional (throughout the band, ripple spacing was a constant proportion of the ripple center frequency). Simultaneous masker was a 0.5-oct noise below-, on-, or above the signal band. Both the low-frequency (center frequency 1 kHz) and on-frequency (the same center frequency as for the signal) maskers increased the thresholds for detecting ripple phase shift. However, the threshold dependence on the masker level was different for these two maskers. For the on-frequency masker, the masking effect primarily depended on the masker/signal ratio: the threshold steeply increased at a ratio of 5 dB, and no shift was detectable at a ratio of 10 dB. For the low-frequency masker, the masking effect primarily depended on the masker level: the threshold increased at a masker level of 80 dB SPL, and no shift was detectable at a masker level of 90 dB (for a signal level of 50 dB) or 100 dB (for a signal level of 80 dB). The high-frequency masker had little effect. The data were successfully simulated using an excitation-pattern model. In this model, the effect of the on-frequency masker appeared to be primarily due to a decrease of ripple depth. The effect of the low-frequency masker appeared due to widening of the auditory filters at high sound levels.

Hearing Sensitivity to Shifts of Rippled-Spectrum Sound Signals in Masking Noise

PubMed Central

Nechaev, Dmitry I.; Milekhina, Olga N.; Supin, Alexander Ya.

2015-01-01

The goal of the study was to enlarge knowledge of discrimination of complex sound signals by the auditory system in masking noise. For that, influence of masking noise on detection of shift of rippled spectrum was studied in normal listeners. The signal was a shift of ripple phase within a 0.5-oct wide rippled spectrum centered at 2 kHz. The ripples were frequency-proportional (throughout the band, ripple spacing was a constant proportion of the ripple center frequency). Simultaneous masker was a 0.5-oct noise below-, on-, or above the signal band. Both the low-frequency (center frequency 1 kHz) and on-frequency (the same center frequency as for the signal) maskers increased the thresholds for detecting ripple phase shift. However, the threshold dependence on the masker level was different for these two maskers. For the on-frequency masker, the masking effect primarily depended on the masker/signal ratio: the threshold steeply increased at a ratio of 5 dB, and no shift was detectable at a ratio of 10 dB. For the low-frequency masker, the masking effect primarily depended on the masker level: the threshold increased at a masker level of 80 dB SPL, and no shift was detectable at a masker level of 90 dB (for a signal level of 50 dB) or 100 dB (for a signal level of 80 dB). The high-frequency masker had little effect. The data were successfully simulated using an excitation-pattern model. In this model, the effect of the on-frequency masker appeared to be primarily due to a decrease of ripple depth. The effect of the low-frequency masker appeared due to widening of the auditory filters at high sound levels. PMID:26462066

Study on the cloud detection of GOCI by using the simulated surface reflectance from BRDF-model for the land application and meteorological utilization

NASA Astrophysics Data System (ADS)

Kim, Hye-Won; Yeom, Jong-Min; Woo, Sun-Hee; Chae, Tae-Byeong

2016-04-01

COMS (Communication, Ocean, and Meteorological Satellite) was launched at French Guiana Kourou space center on 27 June 2010. Geostationary Ocean Color Imager (GOCI), which is the first ocean color geostationary satellite in the world for observing the ocean phenomena, is able to obtain the scientific data per an hour from 00UTC to 07UTC. Moreover, the spectral channels of GOCI would enable not only monitoring for the ocean, but for extracting the information of the land surface over the Korean Peninsula, Japan, and Eastern China. Since it is extremely important to utilize GOCI data accurately for the land application, cloud pixels over the surface have to be removed. Unfortunately, infra-red (IR) channels that can easily detect the water vapor with the cloud top temperature, are not included in the GOCI sensor. In this paper, the advanced cloud masking algorithm will be proposed with visible and near-IR (NIR) bands that are within GOCI bands. The main obstacle of cloud masking with GOCI is how to handle the high variable surface reflectance, which is mainly depending on the solar zenith angle. In this study, we use semi-empirical BRDF model to simulate the surface reflectance by using 16 day composite cloudy free image. When estimating the simulated surface reflectance, same geometry for GOCI observation was applied. The simulated surface reflectance is used to discriminate cloud areas especially for the thin cloud and shows more reasonable result than original threshold methods.

Standoff imaging of a masked human face using a 670 GHz high resolution radar

NASA Astrophysics Data System (ADS)

Kjellgren, Jan; Svedin, Jan; Cooper, Ken B.

2011-11-01

This paper presents an exploratory attempt to use high-resolution radar measurements for face identification in forensic applications. An imaging radar system developed by JPL was used to measure a human face at 670 GHz. Frontal views of the face were measured both with and without a ski mask at a range of 25 m. The realized spatial resolution was roughly 1 cm in all three dimensions. The surfaces of the ski mask and the face were detected by using the two dominating reflections from amplitude data. Various methods for visualization of these surfaces are presented. The possibility to use radar data to determine certain face distance measures between well-defined face landmarks, typically used for anthropometric statistics, was explored. The measures used here were face length, frontal breadth and interpupillary distance. In many cases the radar system seems to provide sufficient information to exclude an innocent subject from suspicion. For an accurate identification it is believed that a system must provide significantly more information.

Spectrographic imaging system

DOEpatents

Morris, Michael D.; Treado, Patrick J.

1991-01-01

An imaging system for providing spectrographically resolved images. The system incorporates a one-dimensional spatial encoding mask which enables an image to be projected onto a two-dimensional image detector after spectral dispersion of the image. The dimension of the image which is lost due to spectral dispersion on the two-dimensional detector is recovered through employing a reverse transform based on presenting a multiplicity of different spatial encoding patterns to the image. The system is especially adapted for detecting Raman scattering of monochromatic light transmitted through or reflected from physical samples. Preferably, spatial encoding is achieved through the use of Hadamard mask which selectively transmits or blocks portions of the image from the sample being evaluated.

A generalized time-frequency subtraction method for robust speech enhancement based on wavelet filter banks modeling of human auditory system.

PubMed

Shao, Yu; Chang, Chip-Hong

2007-08-01

We present a new speech enhancement scheme for a single-microphone system to meet the demand for quality noise reduction algorithms capable of operating at a very low signal-to-noise ratio. A psychoacoustic model is incorporated into the generalized perceptual wavelet denoising method to reduce the residual noise and improve the intelligibility of speech. The proposed method is a generalized time-frequency subtraction algorithm, which advantageously exploits the wavelet multirate signal representation to preserve the critical transient information. Simultaneous masking and temporal masking of the human auditory system are modeled by the perceptual wavelet packet transform via the frequency and temporal localization of speech components. The wavelet coefficients are used to calculate the Bark spreading energy and temporal spreading energy, from which a time-frequency masking threshold is deduced to adaptively adjust the subtraction parameters of the proposed method. An unvoiced speech enhancement algorithm is also integrated into the system to improve the intelligibility of speech. Through rigorous objective and subjective evaluations, it is shown that the proposed speech enhancement system is capable of reducing noise with little speech degradation in adverse noise environments and the overall performance is superior to several competitive methods.

The VAMPIRES instrument: imaging the innermost regions of protoplanetary discs with polarimetric interferometry

NASA Astrophysics Data System (ADS)

Norris, Barnaby; Schworer, Guillaume; Tuthill, Peter; Jovanovic, Nemanja; Guyon, Olivier; Stewart, Paul; Martinache, Frantz

2015-03-01

Direct imaging of protoplanetary discs promises to provide key insight into the complex sequence of processes by which planets are formed. However, imaging the innermost region of such discs (a zone critical to planet formation) is challenging for traditional observational techniques (such as near-IR imaging and coronagraphy) due to the relatively long wavelengths involved and the area occulted by the coronagraphic mask. Here, we introduce a new instrument - Visible Aperture-Masking Polarimetric Interferometer for Resolving Exoplanetary Signatures (VAMPIRES) - which combines non-redundant aperture-masking interferometry with differential polarimetry to directly image this previously inaccessible innermost region. By using the polarization of light scattered by dust in the disc to provide precise differential calibration of interferometric visibilities and closure phases, VAMPIRES allows direct imaging at and beyond the telescope diffraction limit. Integrated into the SCExAO (Subaru Coronagraphic Extreme Adaptive Optics) system at the Subaru telescope, VAMPIRES operates at visible wavelengths (where polarization is high) while allowing simultaneous infrared observations conducted by HICIAO. Here, we describe the instrumental design and unique observing technique and present the results of the first on-sky commissioning observations, validating the excellent visibility and closure-phase precision which are then used to project expected science performance metrics.

Neural Correlates and Mechanisms of Spatial Release From Masking: Single-Unit and Population Responses in the Inferior Colliculus

PubMed Central

Lane, Courtney C.; Delgutte, Bertrand

2007-01-01

Spatial release from masking (SRM), a factor in listening in noisy environments, is the improvement in auditory signal detection obtained when a signal is separated in space from a masker. To study the neural mechanisms of SRM, we recorded from single units in the inferior colliculus (IC) of barbiturate-anesthetized cats, focusing on low-frequency neurons sensitive to interaural time differences. The stimulus was a broadband chirp train with a 40-Hz repetition rate in continuous broadband noise, and the unit responses were measured for several signal and masker (virtual) locations. Masked thresholds (the lowest signal-to-noise ratio, SNR, for which the signal could be detected for 75% of the stimulus presentations) changed systematically with signal and masker location. Single-unit thresholds did not necessarily improve with signal and masker separation; instead, they tended to reflect the units’ azimuth preference. Both how the signal was detected (through a rate increase or decrease) and how the noise masked the signal response (suppressive or excitatory masking) changed with signal and masker azimuth, consistent with a cross-correlator model of binaural processing. However, additional processing, perhaps related to the signal’s amplitude modulation rate, appeared to influence the units’ responses. The population masked thresholds (the most sensitive unit’s threshold at each signal and masker location) did improve with signal and masker separation as a result of the variety of azimuth preferences in our unit sample. The population thresholds were similar to human behavioral thresholds in both SNR value and shape, indicating that these units may provide a neural substrate for low-frequency SRM. PMID:15857966

Preliminary results for mask metrology using spatial heterodyne interferometry

NASA Astrophysics Data System (ADS)

Bingham, Philip R.; Tobin, Kenneth; Bennett, Marylyn H.; Marmillion, Pat

2003-12-01

Spatial heterodyne interferometry (SHI) is an imaging technique that captures both the phase and amplitude of a complex wavefront in a single high-speed image. This technology was developed at the Oak Ridge National Laboratory (ORNL) and is currently being implemented for semiconductor wafer inspection by nLine Corporation. As with any system that measures phase, metrology and inspection of surface structures is possible by capturing a wavefront reflected from the surface. The interpretation of surface structure heights for metrology applications can become very difficult with the many layers of various materials used on semiconductor wafers, so inspection (defect detection) has been the primary focus for semiconductor wafers. However, masks used for photolithography typically only contain a couple well-defined materials opening the doors to high-speed mask metrology in 3 dimensions in addition to inspection. Phase shift masks often contain structures etched out of the transparent substrate material for phase shifting. While these structures are difficult to inspect using only intensity, the phase and amplitude images captured with SHI can produce very good resolution of these structures. The phase images also provide depth information that is crucial for these phase shift regions. Preliminary testing has been performed to determine the feasibility of SHI for high-speed non-contact mask metrology using a prototype SHI system with 532 nm wavelength illumination named the Visible Alpha Tool (VAT). These results show that prototype SHI system is capable of performing critical dimension measurements on 400nm lines with a repeatability of 1.4nm and line height measurements with a repeatability of 0.26nm. Additionally initial imaging of an alternating aperture phase shift mask has shown the ability of SHI to discriminate between typical phase shift heights.

Simultaneous measurement of temperature and strain using a phase-shifted fiber Bragg grating inscribed by femtosecond laser

NASA Astrophysics Data System (ADS)

Jiang, Yajun; Liu, Chi; Li, Dong; Yang, Dexing; Zhao, Jianlin

2018-04-01

A novel method for simultaneous measurement of temperature and strain using a single phase-shifted fiber Bragg grating (PS-FBG) is proposed. The PS-FBG is produced by exposing the fusion-spliced fiber with a femtosecond laser and uniform phase mask. Due to the non-uniform structure and strain distribution in the fusion-spliced region, the phase-shift changes with different responses during increases to the temperature and strain; by measuring the central wavelengths and the loss difference of two transmission dips, temperature and strain can be determined simultaneously. The resolutions of this particular sensor in measuring temperature and strain are estimated to be  ±1.5 °C and  ±12.2 µɛ in a range from  -50 °C to 150 °C and from 0 µɛ to 2070 µɛ.

Psychometric functions for informational masking

NASA Astrophysics Data System (ADS)

Lutfi, Robert A.; Kistler, Doris J.; Callahan, Michael R.; Wightman, Frederic L.

2003-12-01

The term informational masking has traditionally been used to refer to elevations in signal threshold resulting from masker uncertainty. In the present study, the method of constant stimuli was used to obtain complete psychometric functions (PFs) from 44 normal-hearing listeners in conditions known to produce varying amounts of informational masking. The listener's task was to detect a pure-tone signal in the presence of a broadband noise masker (low masker uncertainty) and in the presence of multitone maskers with frequencies and amplitudes that varied at random from one presentation to the next (high masker uncertainty). Relative to the broadband noise condition, significant reductions were observed in both the slope and the upper asymptote of the PF for multitone maskers producing large amounts of informational masking. Slope was affected more for some listeners and conditions while asymptote was affected more for others; consequently, neither parameter alone was highly predictive of individual thresholds or the amount of informational masking. Mean slopes and asymptotes varied nonmonotonically with the number of masker components in a manner similar to mean thresholds, particularly when the estimated effect of energetic masking on thresholds was subtracted out. As in past studies, the threshold data were well described by a model in which trial-by-trial judgments are based on a weighted sum of levels in dB at the output of independent auditory filters. The psychometric data, however, complicated the model's interpretation in two ways: First, they suggested that, depending on the listener and condition, the weights can either reflect a fixed influence of masker components on each trial or the effect of occasionally mistaking a masker component for the signal from trial to trial. Second, they indicated that in either case the variance of the underlying decision variable as estimated from PF slope is not by itself great enough to account for the observed changes in informational masking.

The effects of decreased audibility produced by high-pass noise masking on cortical event-related potentials to speech sounds/ba/and/da.

PubMed

Martin, B A; Sigal, A; Kurtzberg, D; Stapells, D R

1997-03-01

This study investigated the effects of decreased audibility produced by high-pass noise masking on cortical event-related potentials (ERPs) N1, N2, and P3 to the speech sounds /ba/and/da/presented at 65 and 80 dB SPL. Normal-hearing subjects pressed a button in response to the deviant sound in an oddball paradigm. Broadband masking noise was presented at an intensity sufficient to completely mask the response to the 65-dB SPL speech sounds, and subsequently high-pass filtered at 4000, 2000, 1000, 500, and 250 Hz. With high-pass masking noise, pure-tone behavioral thresholds increased by an average of 38 dB at the high-pass cutoff and by 50 dB one octave above the cutoff frequency. Results show that as the cutoff frequency of the high-pass masker was lowered, ERP latencies to speech sounds increased and amplitudes decreased. The cutoff frequency where these changes first occurred and the rate of the change differed for N1 compared to N2, P3, and the behavioral measures. N1 showed gradual changes as the masker cutoff frequency was lowered. N2, P3, and behavioral measures showed marked changes below a masker cutoff of 2000 Hz. These results indicate that the decreased audibility resulting from the noise masking affects the various ERP components in a differential manner. N1 is related to the presence of audible stimulus energy, being present whether audible stimuli are discriminable or not. In contrast, N2 and P3 were absent when the stimuli were audible but not discriminable (i.e., when the second formant transitions were masked), reflecting stimulus discrimination. These data have implications regarding the effects of decreased audibility on cortical processing of speech sounds and for the study of cortical ERPs in populations with hearing impairment.

Investigation of Techniques for Inventorying Forested Regions. Volume 1: Reflectance Modeling and Empirical Multispectral Analysis of Forest Canopy Components

NASA Technical Reports Server (NTRS)

Nalepka, R. F. (Principal Investigator); Sadowski, F. G.; Malila, W. A.

1977-01-01

The author has identified the following significant results. Effects of vegetation density on overall canopy reflectance differed dramatically, depending on spectral band, base material, and vegetation type. For example, reflectance changes caused by variations in vegetation density were hardly apparant for a simulated burned surface in LANDSAT band 5, while large changes occurred in band 7. When increasing densities of tree overstory were placed over understories, intermediate to dense overstories effectively masked the understories and dominated the spectral signatures. Dramatic changes in reflectance occurred for canopies placed on a number of varying topographic positions. Such changes were seen to result in the spectral overlap of some nonforested with densely forested situations.

Fabrication of a simultaneous red-green-blue reflector using single-pitched cholesteric liquid crystals.

PubMed

Ha, Na Young; Ohtsuka, Youko; Jeong, Soon Moon; Nishimura, Suzushi; Suzaki, Goroh; Takanishi, Yoichi; Ishikawa, Ken; Takezoe, Hideo

2008-01-01

A cholesteric liquid crystal (CLC) is a self-assembled photonic crystal formed by rodlike molecules, including chiral molecules, that arrange themselves in a helical fashion. The CLC has a single photonic bandgap and an associated one-colour reflection band for circularly polarized light with the same handedness as the CLC helix (selective reflection). These optical characteristics, particularly the circular polarization of the reflected light, are attractive for applications in reflective colour displays without using a backlight, for use as polarizers or colour filters and for mirrorless lasing. Recently, we showed by numerical simulation that simultaneous multicolour reflection is possible by introducing fibonaccian phase defects. Here, we design and fabricate a CLC system consisting of thin isotropic films and of polymeric CLC films, and demonstrate experimentally simultaneous red, green and blue reflections (multiple photonic bandgaps) using the single-pitched polymeric CLC films. The experimental reflection spectra are well simulated by calculations. The presented system can extend applications of CLCs to a wide-band region and could give rise to new photonic devices, in which white or multicolour light is manipulated.

Evaluation of TF11 attenuated-PSM mask blanks with DUV laser patterning

NASA Astrophysics Data System (ADS)

Xing, Kezhao; Björnberg, Charles; Karlsson, Henrik; Paulsson, Adisa; Beiming, Peter; Vedenpää, Jukka; Walford, Jonathan

2008-05-01

Tightening requirements on resolution, CD uniformity and positional accuracy push the development of improved photomask blanks. One such blank for 45nm node attenuated phase shift masks (att-PSM) provides a thinner chrome film, TF11, with a higher etch rate compared to previous generation NTAR5 att-PSM blanks from the same supplier. FEP-171, a positive chemically amplified resist, is commonly used in mask manufacturing for both e-beam and DUV laser pattern generators. TF11 chrome allows the FEP-171 resist thickness to be decreased at least down to 2000 Å while maintaining sufficient etch resistance, thereby improving photomask CD performance. The lower stress level in TF11 chrome films also reduces the image placement error induced by the material. In this study, TF11 chrome and FEP-171 resist are evaluated with exposures on a 248 nm DUV laser pattern generator, the Sigma7500. Patterning is first characterized for resist thicknesses of 2000 Å to 2600 Å in steps of 100 Å, assessing the minimum feature resolution, CD linearity, isolated-dense CD bias and dose sensitivity. Swing curve analysis shows a minimum near 2200 Å and a maximum near 2500 Å, corresponding closely to the reflectivity measurements provided by the blank supplier. The best overall patterning performance is obtained when operating near the swing maximum. The patterning performance is then studied in more detail with a resist thickness of 2550 Å that corresponds to the reflectivity maximum. This is compared to the results with 2000 Å resist, a standard thickness for e-beam exposures on TF11. The lithographic performance on NTAR5 att-PSM blanks with 3200 Å resist is also included for reference. This evaluation indicates that TF11 blanks with 2550 Å resist provide the best overall mask patterning performance obtained with the Sigma7500, showing a global CD uniformity below 4 nm (3s) and minimum feature resolution below 100 nm.

Recovery from forward masking in cochlear implant listeners depends on stimulation mode, level, and electrode location

PubMed Central

Chatterjee, Monita; Kulkarni, Aditya M.

2017-01-01

Psychophysical recovery from forward masking was measured in adult cochlear implant users of CochlearTM and Advanced BionicsTM devices, in monopolar and in focused (bipolar and tripolar) stimulation modes, at four electrode sites across the arrays, and at two levels (loudness balanced across modes and electrodes). Results indicated a steeper psychophysical recovery from forward masking in monopolar over bipolar and tripolar modes, modified by differential effects of electrode and level. The interactions between factors varied somewhat across devices. It is speculated that psychophysical recovery from forward masking may be driven by different populations of neurons in the different modes, with a broader stimulation pattern resulting in a greater likelihood of response by healthier and/or faster-recovering neurons within the stimulated population. If a more rapid recovery from prior stimulation reflects responses of neurons not necessarily close to the activating site, the spectral pattern of the incoming acoustic signal may be distorted. These results have implications for speech processor implementations using different degrees of focusing of the electric field. The primary differences in the shape of the recovery function were observed in the earlier portion (between 2 and 45 ms) of recovery, which is significant in terms of the speech envelope. PMID:28682084

How to use a phase-only spatial light modulator as a color display.

PubMed

Harm, Walter; Jesacher, Alexander; Thalhammer, Gregor; Bernet, Stefan; Ritsch-Marte, Monika

2015-02-15

We demonstrate that a parallel aligned liquid crystal on silicon (PA-LCOS) spatial light modulator (SLM) without any attached color mask can be used as a full color display with white light illumination. The method is based on the wavelength dependence of the (voltage controlled) birefringence of the liquid crystal pixels. Modern SLMs offer a wide range over which the birefringence can be modulated, leading (in combination with a linear polarizer) to several intensity modulation periods of a reflected light wave as a function of the applied voltage. Because of dispersion, the oscillation period strongly depends on the wavelength. Thus each voltage applied to an SLM pixel corresponds to another reflected color spectrum. For SLMs with a sufficiently broad tuning range, one obtains a color palette (i.e., a "color lookup-table"), which allows one to display color images. An advantage over standard liquid crystal displays (LCDs), which use color masks in front of the individual pixels, is that the light efficiency and the display resolution are increased by a factor of three.

Cloud Detection with the Earth Polychromatic Imaging Camera (EPIC)

NASA Technical Reports Server (NTRS)

Meyer, Kerry; Marshak, Alexander; Lyapustin, Alexei; Torres, Omar; Wang, Yugie

2011-01-01

The Earth Polychromatic Imaging Camera (EPIC) on board the Deep Space Climate Observatory (DSCOVR) would provide a unique opportunity for Earth and atmospheric research due not only to its Lagrange point sun-synchronous orbit, but also to the potential for synergistic use of spectral channels in both the UV and visible spectrum. As a prerequisite for most applications, the ability to detect the presence of clouds in a given field of view, known as cloud masking, is of utmost importance. It serves to determine both the potential for cloud contamination in clear-sky applications (e.g., land surface products and aerosol retrievals) and clear-sky contamination in cloud applications (e.g., cloud height and property retrievals). To this end, a preliminary cloud mask algorithm has been developed for EPIC that applies thresholds to reflected UV and visible radiances, as well as to reflected radiance ratios. This algorithm has been tested with simulated EPIC radiances over both land and ocean scenes, with satisfactory results. These test results, as well as algorithm sensitivity to potential instrument uncertainties, will be presented.

Relationship between visual binding, reentry and awareness.

PubMed

Koivisto, Mika; Silvanto, Juha

2011-12-01

Visual feature binding has been suggested to depend on reentrant processing. We addressed the relationship between binding, reentry, and visual awareness by asking the participants to discriminate the color and orientation of a colored bar (presented either alone or simultaneously with a white distractor bar) and to report their phenomenal awareness of the target features. The success of reentry was manipulated with object substitution masking and backward masking. The results showed that late reentrant processes are necessary for successful binding but not for phenomenal awareness of the bound features. Binding errors were accompanied by phenomenal awareness of the misbound feature conjunctions, demonstrating that they were experienced as real properties of the stimuli (i.e., illusory conjunctions). Our results suggest that early preattentive binding and local recurrent processing enable features to reach phenomenal awareness, while later attention-related reentrant iterations modulate the way in which the features are bound and experienced in awareness. Copyright © 2011 Elsevier Inc. All rights reserved.

Mask characterization for critical dimension uniformity budget breakdown in advanced extreme ultraviolet lithography

NASA Astrophysics Data System (ADS)

Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

2013-04-01

As the International Technology Roadmap for Semiconductors critical dimension uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. We will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for advanced extreme ultraviolet (EUV) lithography with 1D (dense lines) and 2D (dense contacts) feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CDs and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples. Mask stack reflectivity variations should also be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We also observed mask error enhancement factor (MEEF) through field fingerprints in the studied EUV cases. Variations of MEEF may play a role towards the total intrafield CDU and may need to be taken into account for EUV lithography. We characterized MEEF-through-field for the reviewed features, with results herein, but further analysis of this phenomenon is required. This comprehensive approach to quantifying the mask part of the overall EUV CDU contribution helps deliver an accurate and integral CDU BB per product/process and litho tool. The better understanding of the entire CDU budget for advanced EUVL nodes achieved by Samsung and ASML helps extend the limits of Moore's Law and to deliver successful implementation of smaller, faster and smarter chips in semiconductor industry.

A Comparative Study of the Bidirectional Reflectance Distribution Function of Several Surfaces as a Mid-wave Infrared Diffuse Reflectance Standard

DTIC Science & Technology

2009-03-01

it for the symbology used in this document before reading this chapter. 2.1 BRDF Development In this section, the BRDF will first be briefly be...geometric occlusion term, which was de- picted in Figure 6. This term in the Cook-Torrance model describes the shadowing and masking effects, and is...where the min() function selects the least of the arguments. The first term in the minimum function is where no occlusion of any kind is occurring

Reflective optical imaging systems with balanced distortion

DOEpatents

Hudyma, Russell M.

2001-01-01

Optical systems compatible with extreme ultraviolet radiation comprising four reflective elements for projecting a mask image onto a substrate are described. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical systems are particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput, and allows higher semiconductor device density. The inventive optical systems are characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.

Maternal Reflective Functioning among Mothers with Childhood Maltreatment Histories: Links to Sensitive Parenting and Infant Attachment Security

PubMed Central

Stacks, Ann M.; Muzik, Maria; Wong, Kristyn; Beeghly, Marjorie; Huth-Bocks, Alissa; Irwin, Jessica L.; Rosenblum, Katherine L.

2014-01-01

This study examined relationships among maternal reflective functioning, parenting, infant attachment, and demographic risk in a relatively large (N= 83) socioeconomically diverse sample of women with and without a history of childhood maltreatment and their infants. Most prior research on parental reflective functioning has utilized small homogenous samples. Reflective functioning was assessed with the Parent Development Interview, parenting was coded from videotaped mother-child interactions, and infant attachment was evaluated in Ainsworth's Strange Situation by independent teams of reliable coders masked to maternal history. Reflective functioning was associated with parenting sensitivity and secure attachment, and inversely associated with demographic risk and parenting negativity; however, it was not associated with maternal maltreatment history or PTSD. Parenting sensitivity mediated the relationship between reflective functioning and infant attachment, controlling for demographic risk. Findings are discussed in the context of prior research on reflective functioning and the importance of targeting reflective functioning in interventions. PMID:25028251

Process research of non-CZ silicon material

NASA Technical Reports Server (NTRS)

1983-01-01

High risk, high payoff research areas associated with the Westinghouse process for producing photovoltaic modules using non- CZ sheet material were investigated. All work was performed using dendritic web silicon. The following tasks are discussed and associated technical results are given: (1) determining the technical feasibility of forming front and back junctions in non-CT silicon using dopant techniques; (2) determining the feasibility of forming a liquid applied diffusion mask to replace the more costly chemical vapor deposited SiO2 diffusion mask; (3) determining the feasibility of applying liquid anti-reflective solutions using meniscus coating equipment; (4) studying the production of uniform, high efficiency solar cells using ion implanation junction formation techniques; and (5) quantifying cost improvements associated with process improvements.

Method for extreme ultraviolet lithography

DOEpatents

Felter, T. E.; Kubiak, Glenn D.

1999-01-01

A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

Method for extreme ultraviolet lithography

DOEpatents

Felter, T. E.; Kubiak, G. D.

2000-01-01

A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods.

Isolating the Energetic Component of Speech-on-Speech Masking With Ideal Time-Frequency Segregation

DTIC Science & Technology

2006-12-01

Auditory Scene Analysis MIT Press, Cambridge, MA. Bronkhorst, A., and Plomp, R. 1992. “Effects of multiple speechlike maskers on binaural speech...C. J. 1994. “Perception and computational sepa- ration of simultaneous vowels: Cues arising from low frequency beating ,” J. Acoust. Soc. Am. 95...Litovsky, R., and Culling, J. 2004. “The benefit of binaural hearing in a cocktail party: Effects of location and type of interferer,” J. Acoust. Soc

Plasma cleaning of nanoparticles from EUV mask materials by electrostatics

NASA Astrophysics Data System (ADS)

Lytle, W. M.; Raju, R.; Shin, H.; Das, C.; Neumann, M. J.; Ruzic, D. N.

2008-03-01

Particle contamination on surfaces used in extreme ultraviolet (EUV) mask blank deposition, mask fabrication, and patterned mask handling must be avoided since the contamination can create significant distortions and loss of reflectivity. Particles on the order of 10nm are problematic during MLM mirror fabrication, since the introduced defects disrupt the local Bragg planes. The most serious problem is the accumulation of particles on surfaces of patterned blanks during EUV light exposure, since > 25nm particles will be printed without an out-of-focus pellicle. Particle contaminants are also a problem with direct imprint processes since defects are printed every time. Plasma Assisted Cleaning by Electrostatics (PACE) works by utilizing a helicon plasma as well as a pulsed DC substrate bias to charge particle and repel them electrostatically from the surface. Removal of this nature is a dry cleaning method and removes contamination perpendicular from the surface instead of rolling or sweeping the particles off the surface, a benefit when cleaning patterned surfaces where contamination can be rolled or trapped between features. Also, an entire mask can be cleaned at once since the plasma can cover the entire surface, thus there is no need to focus in on an area to clean. Sophisticated particle contamination detection system utilizing high power laser called DEFCON is developed to analyze the particle removal after PACE cleaning process. PACE has shown greater than 90 % particle removal efficiencies for 30 to 220 nm PSL particles on ruthenium capped quartz. Removal results for silicon surfaces and quartz surfaces show similar removal efficiencies. Results of cleaning 80 nm PSL spheres from silicon substrates will be shown.

Sex differences in neural responses to subliminal sad and happy faces in healthy individuals: Implications for depression.

PubMed

Victor, Teresa A; Drevets, Wayne C; Misaki, Masaya; Bodurka, Jerzy; Savitz, Jonathan

2017-01-02

Twice as many women as men suffer from mood and anxiety disorders, yet the biological underpinnings of this phenomenon have been understudied and remain unclear. We and others have shown that the hemodynamic response to subliminally presented sad or happy faces during functional MRI (fMRI) is a robust biomarker for the attentional bias toward negative information classically observed in major depression. Here we used fMRI to compare the performance of healthy females (n = 28) and healthy males (n = 28) on a backward masking task using a fast event-related design with gradient-recalled, echoplanar imaging with sensitivity encoding. The image data were compared across groups using a region-of-interest analysis with small-volume correction to control for multiple testing (P corrected  < 0.05, cluster size ≥ 20 voxels). Notably, compared with males, females showed greater BOLD activity in the subgenual anterior cingulate cortex (sgACC) and the right hippocampus when viewing masked sad vs. masked happy faces. Furthermore, females displayed reduced BOLD activity in the right pregenual ACC and left amygdala when viewing masked happy vs. masked neutral faces. Given that we have previously reported similar findings for depressed participants compared with healthy controls (regardless of gender), our results raise the possibility that on average healthy females show subtle emotional processing biases that conceivably reflect a subgroup of women predisposed to depression. Nevertheless, we note that the differences between males and females were small and derived from region-of-interest rather than voxelwise analyses. © 2016 Wiley Periodicals, Inc. © 2016 Wiley Periodicals, Inc.

Inhibitory masking controls the threshold sensitivity of retinal ganglion cells

PubMed Central

Pan, Feng; Toychiev, Abduqodir; Zhang, Yi; Atlasz, Tamas; Ramakrishnan, Hariharasubramanian; Roy, Kaushambi; Völgyi, Béla; Akopian, Abram

2016-01-01

Key points Retinal ganglion cells (RGCs) in dark‐adapted retinas show a range of threshold sensitivities spanning ∼3 log units of illuminance.Here, we show that the different threshold sensitivities of RGCs reflect an inhibitory mechanism that masks inputs from certain rod pathways.The masking inhibition is subserved by GABAC receptors, probably on bipolar cell axon terminals.The GABAergic masking inhibition appears independent of dopaminergic circuitry that has been shown also to affect RGC sensitivity.The results indicate a novel mechanism whereby inhibition controls the sensitivity of different cohorts of RGCs. This can limit and thereby ensure that appropriate signals are carried centrally in scotopic conditions when sensitivity rather than acuity is crucial. Abstract The responses of rod photoreceptors, which subserve dim light vision, are carried through the retina by three independent pathways. These pathways carry signals with largely different sensitivities. Retinal ganglion cells (RGCs), the output neurons of the retina, show a wide range of sensitivities in the same dark‐adapted conditions, suggesting a divergence of the rod pathways. However, this organization is not supported by the known synaptic morphology of the retina. Here, we tested an alternative idea that the rod pathways converge onto single RGCs, but inhibitory circuits selectively mask signals so that one pathway predominates. Indeed, we found that application of GABA receptor blockers increased the sensitivity of most RGCs by unmasking rod signals, which were suppressed. Our results indicate that inhibition controls the threshold responses of RGCs under dim ambient light. This mechanism can ensure that appropriate signals cross the bottleneck of the optic nerve in changing stimulus conditions. PMID:27350405

A geometrical optics polarimetric bidirectional reflectance distribution function for dielectric and metallic surfaces.

PubMed

Hyde, M W; Schmidt, J D; Havrilla, M J

2009-11-23

A polarimetric bidirectional reflectance distribution function (pBRDF), based on geometrical optics, is presented. The pBRDF incorporates a visibility (shadowing/masking) function and a Lambertian (diffuse) component which distinguishes it from other geometrical optics pBRDFs in literature. It is shown that these additions keep the pBRDF bounded (and thus a more realistic physical model) as the angle of incidence or observation approaches grazing and better able to model the behavior of light scattered from rough, reflective surfaces. In this paper, the theoretical development of the pBRDF is shown and discussed. Simulation results of a rough, perfect reflecting surface obtained using an exact, electromagnetic solution and experimental Mueller matrix results of two, rough metallic samples are presented to validate the pBRDF.

Transient Auditory Storage of Acoustic Details Is Associated with Release of Speech from Informational Masking in Reverberant Conditions

ERIC Educational Resources Information Center

Huang, Ying; Huang, Qiang; Chen, Xun; Wu, Xihong; Li, Liang

2009-01-01

Perceptual integration of the sound directly emanating from the source with reflections needs both temporal storage and correlation computation of acoustic details. We examined whether the temporal storage is frequency dependent and associated with speech unmasking. In Experiment 1, a break in correlation (BIC) between interaurally correlated…

The Man behind the Mask: A Principal's Search for a Moral Leadership Purpose

ERIC Educational Resources Information Center

Lane, James F., Jr.

2013-01-01

The purpose of this autoethnographic narrative inquiry was for the researcher to describe and explain how he discovered, constructed, and refined his sense of moral purpose as a principal during his seven-year tenure at Orange Pines Middle School. He inductively analyzed and reflected primarily on self-authored texts tied to critical professional…

Take a byte out of MEEF: VAMPIRE: Vehicle for Advanced Mask Pattern Inspection Readiness Evaluations

NASA Astrophysics Data System (ADS)

Badger, Karen D.; Rankin, Jed; Turley, Christina; Seki, Kazunori; Dechene, Dan J.; Abdelghany, Hesham

2016-09-01

MEEF, or Mask Error Enhancement Factor, is simply defined as the ratio of the change in printed wafer feature width to the change in mask feature width scaled to wafer level. It is important in chip manufacturing that leads to the amplification of mask errors, creating challenges with both achieving dimensional control tolerances and ensuring defect free masks, as measured by on-wafer image quality. As lithographic imaging continues to be stressed, using lower and lower k1 factor resolution enhancement techniques, the high MEEF areas present on advanced optical masks creates an environment where the need for increased mask defect sensitivity in high-MEEF areas becomes more and more critical. There are multiple approaches to mask inspection that may or may not provide enough sensitivity to detect all wafer-printable defects; the challenge in the application of these techniques is simultaneously maintaining an acceptable level of mask inspectability. The higher the MEEF, the harder the challenge will be to achieve and appropriate level of sensitivity while maintaining inspectability…and to do so on the geometries that matter. The predominant photomask fabrication inspection approach in use today compares the features on the reticle directly with the design database using high-NA optics. This approach has the ability to detect small defects, however, when inspecting aggressive OPC, it can lead to the over-detection of inconsequential, or nuisance defects. To minimize these nuisance detections, changing the sensitivity of the inspection can improve the inspectability of a mask inspected in high-NA mode, however, it leads to the inability to detect subtle, yet wafer-printable defects in High-MEEF geometry, due to the fact that this `desense' must be applied globally. There are also `lithography-emulating' approaches to inspection that use various means to provide high defect sensitivity and the ability to tolerate inconsequential, non-printing defects by using scanner-like conditions to determine which defects are wafer printable. This inspection technique is commonly referred to as being `lithography plane' or `litho plane,' since it's assessing the mask quality based on how the mask appears to the imaging optics during use, as proposed to traditional `reticle plane' inspection which is comparing the mask only with its target design. Regardless of how the defects are detected, the real question is when should they be detected? For larger technology nodes, defects are considered `statistical risks'…i.e., first they have to occur, and then they have to fall in high-MEEF areas in order to be of concern, and be below the detection limits of traditional reticle-plane inspection. In short, the `perfect storm' has to happen in order to miss printable defects using well-optimized traditional inspection approaches. The introduction of lithographic inspection techniques has revealed this statistical game is a much higher risk than originally estimated, in that very subtle waferprintable CD errors typically fall into the desense band for traditional reticle plane inspection. Because printability is largely influenced by MEEF, designs with high-MEEF values are at greater risk of traditional inspection missing printable CD errors. The question is… how high is high… and at what MEEF is optical inspection at the reticle plane sufficient? This paper will provide evaluation results for both reticle-plane and litho-plane inspections as they pertain to varying degrees of MEEF. A newly designed high-MEEF programmed defect test mask, named VAMPIRE, will be introduced. This test mask is based on 7 nm node technology and contains intentionally varying degrees of MEEF as well as a variety of programmed defects in high-MEEF environments…all of which have been verified for defect lithographic significance on a Zeiss AIMS system.

Full-wave and half-wave rectification in second-order motion perception

NASA Technical Reports Server (NTRS)

Solomon, J. A.; Sperling, G.

1994-01-01

Microbalanced stimuli are dynamic displays which do not stimulate motion mechanisms that apply standard (Fourier-energy or autocorrelational) motion analysis directly to the visual signal. In order to extract motion information from microbalanced stimuli, Chubb and Sperling [(1988) Journal of the Optical Society of America, 5, 1986-2006] proposed that the human visual system performs a rectifying transformation on the visual signal prior to standard motion analysis. The current research employs two novel types of microbalanced stimuli: half-wave stimuli preserve motion information following half-wave rectification (with a threshold) but lose motion information following full-wave rectification; full-wave stimuli preserve motion information following full-wave rectification but lose motion information following half-wave rectification. Additionally, Fourier stimuli, ordinary square-wave gratings, were used to stimulate standard motion mechanisms. Psychometric functions (direction discrimination vs stimulus contrast) were obtained for each type of stimulus when presented alone, and when masked by each of the other stimuli (presented as moving masks and also as nonmoving, counterphase-flickering masks). RESULTS: given sufficient contrast, all three types of stimulus convey motion. However, only one-third of the population can perceive the motion of the half-wave stimulus. Observers are able to process the motion information contained in the Fourier stimulus slightly more efficiently than the information in the full-wave stimulus but are much less efficient in processing half-wave motion information. Moving masks are more effective than counterphase masks at hampering direction discrimination, indicating that some of the masking effect is interference between motion mechanisms, and some occurs at earlier stages. When either full-wave and Fourier or half-wave and Fourier gratings are presented simultaneously, there is a wide range of relative contrasts within which the motion directions of both gratings are easily determinable. Conversely, when half-wave and full-wave gratings are combined, the direction of only one of these gratings can be determined with high accuracy. CONCLUSIONS: the results indicate that three motion computations are carried out, any two in parallel: one standard ("first order") and two non-Fourier ("second-order") computations that employ full-wave and half-wave rectification.

Neural Correlates of Auditory Perceptual Awareness and Release from Informational Masking Recorded Directly from Human Cortex: A Case Study.

PubMed

Dykstra, Andrew R; Halgren, Eric; Gutschalk, Alexander; Eskandar, Emad N; Cash, Sydney S

2016-01-01

In complex acoustic environments, even salient supra-threshold sounds sometimes go unperceived, a phenomenon known as informational masking. The neural basis of informational masking (and its release) has not been well-characterized, particularly outside auditory cortex. We combined electrocorticography in a neurosurgical patient undergoing invasive epilepsy monitoring with trial-by-trial perceptual reports of isochronous target-tone streams embedded in random multi-tone maskers. Awareness of such masker-embedded target streams was associated with a focal negativity between 100 and 200 ms and high-gamma activity (HGA) between 50 and 250 ms (both in auditory cortex on the posterolateral superior temporal gyrus) as well as a broad P3b-like potential (between ~300 and 600 ms) with generators in ventrolateral frontal and lateral temporal cortex. Unperceived target tones elicited drastically reduced versions of such responses, if at all. While it remains unclear whether these responses reflect conscious perception, itself, as opposed to pre- or post-perceptual processing, the results suggest that conscious perception of target sounds in complex listening environments may engage diverse neural mechanisms in distributed brain areas.

Antimasking aspects of harp seal (Pagophilus groenlandicus) underwater vocalizations.

PubMed

Serrano, Arturo; Terhune, John M

2002-12-01

Underwater sounds are very important in social communication of harp seals (Pagophilus groenlandicus) because they are the main means of long- and short-distance communication. Individual harp seals must try to avoid being masked and emit only those calls that will benefit them. Underwater vocalizations of harp seals were recorded during the breeding season. The physical characteristics associated with antimasking attributes of 16 call types were examined. Rising frequency or increasing amplitude within calls were not common. Most of the calls ended abruptly (range 145-966 dB/s), but call onset was more gradual. At high calling rates (95.1-135 calls/min) there were significantly more calls overlapping temporally than at medium (75.1-95 calls/min) or low (35-75 calls/min) calling rates, but even at the highest calling rates, 79.1% of the calls were not overlapped. When 2, 3, or 4 calls overlapped, there were significantly fewer frequency separations of less than 1/3 octave than would be expected by chance. This is important because sounds that are separated by less than 1/3 octave likely mask each other. When 2-4 calls are occurring simultaneously, only 4.5% to 14.2% are masked by virtue of being within 1/3 octave from their nearest neighbor. None of the overlappping calls was of the same type. This suggests that the seals are actively listening to each other's calls and are not randomly using the different call types. Harp seals use frequency and temporal separation in conjunction with a wide vocal repertoire to avoid masking each other.

Antimasking aspects of harp seal (Pagophilus groenlandicus) underwater vocalizations

NASA Astrophysics Data System (ADS)

Serrano, Arturo; Terhune, John M.

2002-12-01

Underwater sounds are very important in social communication of harp seals (Pagophilus groenlandicus) because they are the main means of long- and short-distance communication. Individual harp seals must try to avoid being masked and emit only those calls that will benefit them. Underwater vocalizations of harp seals were recorded during the breeding season. The physical characteristics associated with antimasking attributes of 16 call types were examined. Rising frequency or increasing amplitude within calls were not common. Most of the calls ended abruptly (range 145-966 dB/s), but call onset was more gradual. At high calling rates (95.1-135 calls/min) there were significantly more calls overlapping temporally than at medium (75.1-95 calls/min) or low (35-75 calls/min) calling rates, but even at the highest calling rates, 79.1% of the calls were not overlapped. When 2, 3, or 4 calls overlapped, there were significantly fewer frequency separations of less than 1/3 octave than would be expected by chance. This is important because sounds that are separated by less than 1/3 octave likely mask each other. When 2-4 calls are occurring simultaneously, only 4.5% to 14.2% are masked by virtue of being within 1/3 octave from their nearest neighbor. None of the overlappping calls was of the same type. This suggests that the seals are actively listening to each other's calls and are not randomly using the different call types. Harp seals use frequency and temporal separation in conjunction with a wide vocal repertoire to avoid masking each other.

Masking of endotoxin in surfactant samples: Effects on Limulus-based detection systems.

PubMed

Reich, Johannes; Lang, Pierre; Grallert, Holger; Motschmann, Hubert

2016-09-01

Over the last few decades Limulus Amebocyte Lysate (LAL) has been the most sensitive method for the detection of endotoxins (Lipopolysaccharides) and is well accepted in a broad field of applications. Recently, Low Endotoxin Recovery (LER) in biopharmaceutical drug products has been noticed, whereby the detection of potential endotoxin contaminations is not ensured. Notably, most of these drug products contain surfactants, which can have crucial effects on the detectability of endotoxin. In order to analyze the driving forces of LER, endotoxin detection in samples containing nonionic surfactants in various buffer systems was investigated. The results show that the process of LER is kinetically controlled and temperature-dependent. Furthermore, only the simultaneous presence of nonionic surfactants and components capable of forming metal complexes resulted in LER. In addition, capacity experiments show that even hazardous amounts of endotoxin can remain undetectable within such formulation compositions. In conclusion, the LER phenomenon is caused by endotoxin masking and not by test interference. In this process, the supramolecular structure of endotoxin is altered and exhibits only a limited susceptibility in binding to the Factor C of Limulus-based detection systems. We propose a two-step mechanism of endotoxin masking by complex forming agents and nonionic surfactants. Copyright © 2016 The Author(s). Published by Elsevier Ltd.. All rights reserved.

Bilateral Versus Unilateral Cochlear Implantation in Adult Listeners: Speech-On-Speech Masking and Multitalker Localization.

PubMed

Rana, Baljeet; Buchholz, Jörg M; Morgan, Catherine; Sharma, Mridula; Weller, Tobias; Konganda, Shivali Appaiah; Shirai, Kyoko; Kawano, Atsushi

2017-01-01

Binaural hearing helps normal-hearing listeners localize sound sources and understand speech in noise. However, it is not fully understood how far this is the case for bilateral cochlear implant (CI) users. To determine the potential benefits of bilateral over unilateral CIs, speech comprehension thresholds (SCTs) were measured in seven Japanese bilateral CI recipients using Helen test sentences (translated into Japanese) in a two-talker speech interferer presented from the front (co-located with the target speech), ipsilateral to the first-implanted ear (at +90° or -90°), and spatially symmetric at ±90°. Spatial release from masking was calculated as the difference between co-located and spatially separated SCTs. Localization was assessed in the horizontal plane by presenting either male or female speech or both simultaneously. All measurements were performed bilaterally and unilaterally (with the first implanted ear) inside a loudspeaker array. Both SCTs and spatial release from masking were improved with bilateral CIs, demonstrating mean bilateral benefits of 7.5 dB in spatially asymmetric and 3 dB in spatially symmetric speech mixture. Localization performance varied strongly between subjects but was clearly improved with bilateral over unilateral CIs with the mean localization error reduced by 27°. Surprisingly, adding a second talker had only a negligible effect on localization.

If the MODIS Aerosol Product is so Infested with Cloud Contamination, Why Does Everybody Use the Product?

NASA Technical Reports Server (NTRS)

Remeer, Lorraine A.

2011-01-01

The MODIS aerosol cloud mask is based on a spatial variability test, using the assumption that aerosols are more homogeneous than clouds. On top of this first line of defense are a series of additional tests based on threshold values and ratios of various MODIS channels. The goal is to eliminate clouds and keep the aerosol. How well have we succeeded? There have been several studies showing cloud contamination in the MODIS aerosol product and several alternative cloud masks proposed. There are even "competing" MODIS aerosol products that offer an alternative "cloud free" world. Are these alternative products an improvement to the old standard product? We find there is a trade-off between retrieval availability and cloud contamination, and for many applications it is better to have a little bit of cloud in the product than to not have enough product. I will review the decisions that led us to the present MODIS cloud mask, and show how it is simultaneously too liberal and too conservative, some ideas on how to make it better and why in the end it doesn't matter. I hope to inspire a spirited discussion and will be very willing to take your complaints and suggestions.

Simultaneous generation of high-efficiency broadband asymmetric anomalous refraction and reflection waves with few-layer anisotropic metasurface

PubMed Central

Li, Zhancheng; Liu, Wenwei; Cheng, Hua; Liu, Jieying; Chen, Shuqi; Tian, Jianguo

2016-01-01

Optical metasurfaces consisting of single-layer nanostructures have immensely promising applications in wavefront control because they can be used to arbitrarily manipulate wave phase, and polarization. However, anomalous refraction and reflection waves have not yet been simultaneously and asymmetrically generated, and the limited efficiency and bandwidth of pre-existing single-layer metasurfaces hinder their practical applications. Here, a few-layer anisotropic metasurface is presented for simultaneously generating high-efficiency broadband asymmetric anomalous refraction and reflection waves. Moreover, the normal transmission and reflection waves are low and the anomalous waves are the predominant ones, which is quite beneficial for practical applications such as beam deflectors. Our work provides an effective method of enhancing the performance of anomalous wave generation, and the asymmetric performance of the proposed metasurface shows endless possibilities in wavefront control for nanophotonics device design and optical communication applications. PMID:27762286

Dimensions of the epilepsy foundation concerns index.

PubMed

Loring, David W; Larrabee, Glenn J; Meador, Kimford J; Lee, Gregory P

2005-05-01

We performed principal component analysis (PCA) of the Epilepsy Foundation Concerns Index scale in 189 patients undergoing evaluation for epilepsy surgery. We identified a five-factor solution in which there were no varimax-rotated factors consisting of fewer than two questions. Factor 1 reflects affective impact on enjoyment of life, Factor 2 reflects general autonomy concerns, Factor 3 reflects fear of seizure recurrence, Factor 4 reflects concern of being a burden to one's family, and Factor 5 reflects a perceived lack of understanding by others. Multiple regression using the Quality of Life in Epilepsy--89 question version; Minnesota Multiphasic Personality Inventory--2; Wechsler Adult Intelligence Scale--third edition; and verbal and visual memory tests as predictors demonstrated a different pattern of association with the factor and summary scores. We conclude that the Epilepsy Foundation Concerns Index is multidimensional, and using a global score based on all items may mask specific concerns that may be relevant when applied to individual patients.

Boundary conditions for the influence of unfamiliar non-target primes in unconscious evaluative priming: The moderating role of attentional task sets.

PubMed

Kiefer, Markus; Sim, Eun-Jim; Wentura, Dirk

2015-09-01

Evaluative priming by masked emotional stimuli that are not consciously perceived has been taken as evidence that affective stimulus evaluation can also occur unconsciously. However, as masked priming effects were small and frequently observed only for familiar primes that there also presented as visible targets in an evaluative decision task, priming was thought to reflect primarily response activation based on acquired S-R associations and not evaluative semantic stimulus analysis. The present study therefore assessed across three experiments boundary conditions for the emergence of masked evaluative priming effects with unfamiliar primes in an evaluative decision task and investigated the role of the frequency of target repetition on priming with pictorial and verbal stimuli. While familiar primes elicited robust priming effects in all conditions, priming effects by unfamiliar primes were reliably obtained for low repetition (pictures) or unrepeated targets (words), but not for targets repeated at a high frequency. This suggests that unfamiliar masked stimuli only elicit evaluative priming effects when the task set associated with the visible target involves evaluative semantic analysis and is not based on S-R triggered responding as for high repetition targets. The present results therefore converge with the growing body of evidence demonstrating attentional control influences on unconscious processing. Copyright © 2015 Elsevier Inc. All rights reserved.

Automaticity of higher cognitive functions: neurophysiological evidence for unconscious syntactic processing of masked words.

PubMed

Jiménez-Ortega, Laura; García-Milla, Marcos; Fondevila, Sabela; Casado, Pilar; Hernández-Gutiérrez, David; Martín-Loeches, Manuel

2014-12-01

Models of language comprehension assume that syntactic processing is automatic, at least at early stages. However, the degree of automaticity of syntactic processing is still controversial. Evidence of automaticity is either indirect or has been observed for pairs of words, which might provide a poor syntactic context in comparison to sentences. The present study investigates the automaticity of syntactic processing using event-related brain potentials (ERPs) during sentence processing. To this end, masked adjectives that could either be syntactically correct or incorrect relative to a sentence being processed appeared just prior to the presentation of supraliminal adjectives. The latter could also be correct or incorrect. According to our data, subliminal gender agreement violations embedded in a sentence trigger an early anterior negativity-like modulation, whereas supraliminal gender agreement violations elicited a later anterior negativity. First-pass syntactic parsing thus appears to be unconsciously and automatically elicited. Interestingly, a P600-like modulation of short duration and early latency could also be observed for masked violations. In addition, masked violations also modulated the P600 component elicited by unmasked targets, probably reflecting that the mechanisms of revising a structural mismatch appear affected by subliminal information. According to our findings, both conscious and unconscious processes apparently contribute to syntactic processing. These results are discussed in line with most recent theories of automaticity and syntactic processing. Copyright © 2014 Elsevier B.V. All rights reserved.

Optical effects of shadow masks on short circuit current of organic photovoltaic devices.

PubMed

Lin, Chi-Feng; Lin, Bing-Hong; Liu, Shun-Wei; Hsu, Wei-Feng; Zhang, Mi; Chiu, Tien-Lung; Wei, Mau-Kuo; Lee, Jiun-Haw

2012-03-21

In this paper, we have employed different shadow masks attached on top of organic photovoltaic (OPV) devices to study the optical effects of the former on the short circuit current (J(SC)). To rule out possible lateral electrical conduction and simplify the optical effects inside the device, a small-molecular heterojunction OPV device with a clear donor/acceptor interface was employed with a hole extraction layer exhibiting high resistance intentionally. Careful calibration with a shadow mask was employed. By attaching two layers of opaque masks in combination with a suitable holder design to shield the light from the edges and backside, the value of J(SC) approached that of the dark current, even under 1-sun radiation. With different illumination areas, we found that the photons illuminating the non-active region of the device contributed to 40% of the J(SC) by optical effect within the width of about 1 mm around the active region. When illuminating the non-active area with 12 mm to the active area, a 5.6 times improvement in the J(SC) was observed when the incident angle was 75°. With the introduction of a microstructured film onto the OPV device and an increase in the reflection from the non-active region, a 15% enhancement of the J(SC) compared to the control device was achieved.

Two Words, One Meaning: Evidence of Automatic Co-Activation of Translation Equivalents

PubMed Central

Dimitropoulou, Maria; Duñabeitia, Jon Andoni; Carreiras, Manuel

2011-01-01

Research on the processing of translations offers important insights on how bilinguals negotiate the representation of words from two languages in one mind and one brain. Evidence so far has shown that translation equivalents effectively activate each other as well as their shared concept even when translations lack of any formal overlap (i.e., non-cognates) and even when one of them is presented subliminally, namely under masked priming conditions. In the lexical decision studies testing masked translation priming effects with unbalanced bilinguals a remarkably stable pattern emerges: larger effects in the dominant (L1) to the non-dominant (L2) translation direction, than vice versa. Interestingly, this asymmetry vanishes when simultaneous and balanced bilinguals are tested, suggesting that the linguistic profile of the bilinguals could be determining the pattern of cross-language lexico-semantic activation across the L2 learning trajectory. The present study aims to detect whether L2 proficiency is the critical variable rendering the otherwise asymmetric cross-language activation of translations obtained in the lexical decision task into symmetric. Non-cognate masked translation priming effects were examined with three groups of Greek (L1)–English (L2) unbalanced bilinguals, differing exclusively at their level of L2 proficiency. Although increased L2 proficiency led to improved overall L2 performance, masked translation priming effects were virtually identical across the three groups, yielding in all cases significant but asymmetric effects (i.e., larger effects in the L1 → L2 than in the L2 → L1 translation direction). These findings show that proficiency does not modulate masked translation priming effects at intermediate levels, and that a native-like level of L2 proficiency is needed for symmetric effects to emerge. They furthermore, pose important constraints on the operation of the mechanisms underlying the development of cross-language lexico-semantic links. PMID:21886634

Partially Transparent Petaled Mask/Occulter for Visible-Range Spectrum

NASA Technical Reports Server (NTRS)

Shiri, Ron Shahram; Wasylkiwskyj, Wasyl

2013-01-01

The presence of the Poisson Spot, also known as the spot of Arago, has been known since the 18th century. This spot is the consequence of constructive interference of light diffracted by the edge of the obstacle where the central position can be determined by symmetry of the object. More recently, many NASA missions require the suppression of this spot in the visible range. For instance, the exoplanetary missions involving space telescopes require telescopes to image the planetary bodies orbiting central stars. For this purpose, the starlight needs to be suppressed by several orders of magnitude in order to image the reflected light from the orbiting planet. For the Earth-like planets, this suppression needs to be at least ten orders of magnitude. One of the common methods of suppression involves sharp binary petaled occulters envisioned to be placed many thousands of miles away from the telescope blocking the starlight. The suppression of the Poisson Spot by binary sharp petal tips can be problematic when the thickness of the tips becomes smaller than the wavelength of the incident beam. First they are difficult to manufacture and also it invalidates the laws of physical optics. The proposed partially transparent petaled masks/occulters compensate for this sharpness with transparency along the surface of the petals. Depending on the geometry of the problem, this transparency can be customized such that only a small region of the petal is transparent and the remaining of the surface is opaque. This feature allows easy fabrication of this type of occultation device either as a mask or occulter. A partially transparent petaled mask/ occulter has been designed for the visible spectrum range. The mask/occulter can suppress the intensity along the optical axis up to ten orders of magnitude. The design process can tailor the mask shape, number of petals, and transparency level to the near-field and farfield diffraction region. The mask/occulter can be used in space astronomy, ground-based telescope, and high-energy laser systems, and optical lithography to eliminate the Poisson Spot.

Identification of Dust Source Regions at High-Resolution and Dynamics of Dust Source Mask over Southwest United States Using Remote Sensing Data

NASA Astrophysics Data System (ADS)

Sprigg, W. A.; Sahoo, S.; Prasad, A. K.; Venkatesh, A. S.; Vukovic, A.; Nickovic, S.

2015-12-01

Identification and evaluation of sources of aeolian mineral dust is a critical task in the simulation of dust. Recently, time series of space based multi-sensor satellite images have been used to identify and monitor changes in the land surface characteristics. Modeling of windblown dust requires precise delineation of mineral dust source and its strength that varies over a region as well as seasonal and inter-annual variability due to changes in land use and land cover. Southwest USA is one of the major dust emission prone zone in North American continent where dust is generated from low lying dried-up areas with bare ground surface and they may be scattered or appear as point sources on high resolution satellite images. In the current research, various satellite derived variables have been integrated to produce a high-resolution dust source mask, at grid size of 250 m, using data such as digital elevation model, surface reflectance, vegetation cover, land cover class, and surface wetness. Previous dust source models have been adopted to produce a multi-parameter dust source mask using data from satellites such as Terra (Moderate Resolution Imaging Spectroradiometer - MODIS), and Landsat. The dust source mask model captures the topographically low regions with bare soil surface, dried-up river plains, and lakes which form important source of dust in southwest USA. The study region is also one of the hottest regions of USA where surface dryness, land use (agricultural use), and vegetation cover changes significantly leading to major changes in the areal coverage of potential dust source regions. A dynamic high resolution dust source mask have been produced to address intra-annual change in the aerial extent of bare dry surfaces. Time series of satellite derived data have been used to create dynamic dust source masks. A new dust source mask at 16 day interval allows enhanced detection of potential dust source regions that can be employed in the dust emission and transport pathways models for better estimation of emission of dust during dust storms, particulate air pollution, public health risk assessment tools and decision support systems.

Wearing face masks in public during the influenza season may reflect other positive hygiene practices in Japan.

PubMed

Wada, Koji; Oka-Ezoe, Kuniko; Smith, Derek R

2012-12-10

Although the wearing of face masks in public has not been recommended for preventing influenza, these devices are often worn in many Asian countries during the influenza season. In Japan, it is thought that such behavior may be an indicator of other positive hygiene practices. The aim of this study, therefore, was to determine if wearing a face mask in public is associated with other positive hygiene practices and health behaviors among Japanese adults. We initially recruited around 3,000 Japanese individuals ranging from 20 to 69 years of age who were registered with a web survey company. Participants were asked to recall their personal hygiene practices during the influenza season of the previous year. Logistic regression analysis was then used to examine the associations between wearing a face mask in public and personal hygiene practices and health behaviors. A total of 3,129 persons responded to the survey, among whom 38% reported that they had worn a face mask in public during the previous influenza season. Wearing a face mask in public was associated with various self-reported hygiene practices including: frequent hand washing (adjusted Odds Ratio [OR]: 1.67; 95% Confidence Interval [95%CI]: 1.34-1.96), occasional hand washing (OR: 1.43; 95%CI: 1.10-1.75), frequently avoiding crowds (OR: 1.85; 95%CI: 1.70-1.98), occasionally avoiding crowds (OR: 1.65; 95%CI: 1.53-1.76), frequent gargling (OR: 1.68; 95%CI: 1.51-1.84), occasional gargling (OR: 1.46; 95%CI: 1.29-1.62), regularly avoiding close contact with an infected person (OR: 1.50; 95%CI: 1.33-1.67), occasionally avoiding close contact with an infected person (OR: 1.31; 95%CI: 1.16-1.46), and being vaccinated of influenza in the last season (OR: 1.31; 95%CI: 1.17-1.45). Overall, this study suggests that wearing a face mask in public may be associated with other personal hygiene practices and health behaviors among Japanese adults. Rather than preventing influenza itself, face mask use might instead be a marker of additional, positive hygiene practices and other favorable health behaviors in the same individuals.

Mask characterization for CDU budget breakdown in advanced EUV lithography

NASA Astrophysics Data System (ADS)

Nikolsky, Peter; Strolenberg, Chris; Nielsen, Rasmus; Nooitgedacht, Tjitte; Davydova, Natalia; Yang, Greg; Lee, Shawn; Park, Chang-Min; Kim, Insung; Yeo, Jeong-Ho

2012-11-01

As the ITRS Critical Dimension Uniformity (CDU) specification shrinks, semiconductor companies need to maintain a high yield of good wafers per day and a high performance (and hence market value) of finished products. This cannot be achieved without continuous analysis and improvement of on-product CDU as one of the main drivers for process control and optimization with better understanding of main contributors from the litho cluster: mask, process, metrology and scanner. In this paper we will demonstrate a study of mask CDU characterization and its impact on CDU Budget Breakdown (CDU BB) performed for an advanced EUV lithography with 1D and 2D feature cases. We will show that this CDU contributor is one of the main differentiators between well-known ArFi and new EUV CDU budgeting principles. We found that reticle contribution to intrafield CDU should be characterized in a specific way: mask absorber thickness fingerprints play a role comparable with reticle CDU in the total reticle part of the CDU budget. Wafer CD fingerprints, introduced by this contributor, may or may not compensate variations of mask CD's and hence influence on total mask impact on intrafield CDU at the wafer level. This will be shown on 1D and 2D feature examples in this paper. Also mask stack reflectivity variations should be taken into account: these fingerprints have visible impact on intrafield CDs at the wafer level and should be considered as another contributor to the reticle part of EUV CDU budget. We observed also MEEF-through-field fingerprints in the studied EUV cases. Variations of MEEF may also play a role for the total intrafield CDU and may be taken into account for EUV Lithography. We characterized MEEF-through-field for the reviewed features, the results to be discussed in our paper, but further analysis of this phenomenon is required. This comprehensive approach to characterization of the mask part of EUV CDU characterization delivers an accurate and integral CDU Budget Breakdown per product/process and Litho tool. The better understanding of the entire CDU budget for advanced EUVL nodes achieved by Samsung and ASML helps to extend the limits of Moore's Law and to deliver successful implementation of smaller, faster and smarter chips in semiconductor industry.

Ionization chamber dosimeter

DOEpatents

Renner, Tim R.; Nyman, Mark A.; Stradtner, Ronald

1991-01-01

A method for fabricating an ion chamber dosimeter collecting array of the type utilizing plural discrete elements formed on a uniform collecting surface which includes forming a thin insulating layer over an aperture in a frame having surfaces, forming a predetermined pattern of through holes in the layer, plating both surfaces of the layer and simultaneously tilting and rotating the frame for uniform plate-through of the holes between surfaces. Aligned masking and patterned etching of the surfaces provides interconnects between the through holes and copper leads provided to external circuitry.

Implementation of trinary logic in a polarization encoded optical shadow-casting scheme.

PubMed

Rizvi, R A; Zaheer, K; Zubairy, M S

1991-03-10

The design of various multioutput trinary combinational logic units by a polarization encoded optical shadow-casting (POSC) technique is presented. The POSC modified algorithm is employed to design and implement these logic elements in a trinary number system with separate and simultaneous generation of outputs. A detailed solution of the POSC logic equations for a fixed source plane and a fixed decoding mask is given to obtain input pixel coding for a trinary half-adder, full adder, and subtractor.

A Comparison of Different Techniques for Interfacing Capnography With Adult and Pediatric Supplemental Oxygen Masks.

PubMed

Phillips, Justin S; Pangilinan, Lance P; Mangalindan, Earl R E; Booze, Joseph L; Kallet, Richard H

2017-01-01

Accurately measuring the partial pressure of end-tidal CO 2 (P ETCO 2 ) in non-intubated patients is problematic due to dilution of expired CO 2 at high O 2 flows and mask designs that may either cause CO 2 rebreathing or inadequately capture expired CO 2 . We evaluated the performance of 2 capnographic O 2 masks (Cap-ONE and OxyMask) against a clinically expedient method using a standard O 2 mask with a flow-directed nasal cannula used for capnography (CapnoLine) in a spontaneous breathing model of an adult and child under conditions of normal ventilation, hypoventilation, and hyperventilation. An ASL-5000 simulator was attached to a manikin face with a catheter port, through which various CO 2 /air mixtures were bled into the ASL-5000 to achieve a P ETCO 2 of 40, 65, and 30 mm Hg. Both P ETCO 2 and inspired P CO 2 were measured at O 2 flows of 5, 10, 15, and 20 L/min (adult model) and 2, 4, 6, 8, and 10 L/min (pediatric model). P ETCO 2 decreased to varying degrees as O 2 flow increased, depending upon the breathing pattern. Although all devices appeared to perform reasonably well under normal and hyperventilation conditions, the clinically expedient method was associated with substantially more CO 2 rebreathing. P ETCO 2 usually deteriorated more under simulated hypoventilation, regardless of the measurement method. Both of the specially designed O 2 capnography masks provided reasonably stable P ETCO 2 without significant CO 2 rebreathing at the commonly used O 2 flows. Because of their open design, P ETCO 2 measured at high O 2 flows may produce artificially lower readings that may not reflect arterial CO 2 levels compared with lower O 2 flows. Copyright © 2017 by Daedalus Enterprises.

Intensive two-day cognitive-behavioral intervention decreases cortisol secretion in soldiers suffering from specific phobia to wear protective mask.

PubMed

Brand, Serge; Annen, Hubert; Holsboer-Trachsler, Edith; Blaser, Andreas

2011-10-01

Wearing a protective mask is compulsory for those in professions such as fire-fighters, rescue personnel and soldiers. The phobia to wear a protective mask is considered a specific claustrophobia and may become of major concern during military service. To date, no data are available with respect to the hypothalamus-pituitary-adrenocortical system activity (HPA SA) for both the so-called protective mask phobia (PMP) and its treatment. The aim of the present study was three-fold: 1) to assess HPA SA in soldiers suffering from PMP before and after intensive cognitive-behavioral treatment, 2) to compare these data with controls, and 3) to relate these data to subjective sleep. 46 Swiss Army recruits suffering from PMP were enrolled in a two-day intensive treatment course. During initial and final assessments, saliva was sampled to analyse HPA SA via salivary cortisol; saliva samples were also gathered in the morning. For comparison, saliva samples were gathered of 39 Emergency Rescue Service (ERS) recruits. All participants also completed a questionnaire related to sleep and to anxiety. Compared to controls from the ERS, among army recruits suffering from PMP, cortisol secretion was significantly higher during initial and final assessments, and in the morning. Cortisol secretion decreased from initial and final assessment. Subjectively assessed sleep was more impaired in recruits suffering from PMP compared to controls. After cognitive-behavioral treatment, all recruits suffering from PMP were able to wear the protective mask. Specific phobia about wearing a protective mask is treatable via a two-day intensive course. Treatment success is reflected in modified HPA SA. Methodology and results may be transferred to treat patients suffering from sleep apnea syndrome and presenting high anxiety about wearing continuous positive airway pressure devices. Copyright © 2011 Elsevier Ltd. All rights reserved.

Harmonized Landsat/Sentinel-2 Reflectance Products for Land Monitoring (Invited)

NASA Technical Reports Server (NTRS)

Masek, Jeffrey G.; Dungan, Jennifer L.; Ju, Junchang; Roger, Jean-Claude; Claverie, Martin P.; Skakun, Sergii; Vermote, Eric; Justice, Christopher Owen

2017-01-01

Many land applications require more frequent observations than can be obtained from a single 'Landsat class'� sensor. Agricultural monitoring, inland water quality assessment, stand-scale phenology, and numerous other applications all require near-daily imagery at better than 1ha resolution. Thus the land science community has begun expressing a desire for a '30-meter MODIS' global monitoring capability. One cost-effective way to achieve this goal is via merging data from multiple, international observatories into a single virtual constellation. The Harmonized Landsat/Sentinel-2 (HLS) project has been working to generate a seamless surface reflectance product by combining observations from USGS/NASA Landsat-8 and ESA Sentinel-2. Harmonization in this context requires a series of radiometric and geometric transforms to create a single surface reflectance time series agnostic to sensor origin. Radiometric corrections include a common atmospheric correction using the Landsat-8 LaSRC/6S approach, a simple BRDF adjustment to constant solar and nadir view angle, and spectral bandpass adjustments to fit the Landsat-8 OLI reference. Data are then resampled to a consistent 30m UTM grid, using the Sentinel-2 global tile system. Cloud and shadow masking are also implemented. Quality assurance (QA) involves comparison of the output 30m HLS products with near-simultaneous MODIS nadir-adjusted observations. Prototoype HLS products have been processed for approximately 7% of the global land area using the NASA Earth Exchange (NEX) compute environment at NASA Ames, and can be downloaded from the HLS web site (https://hls.gsfc.nasa.gov). A wall-to-wall North America data set is being prepared for 2018. This talk will review the objectives and status of the HLS project, and illustrate applications of high-density optical time series data for agriculture and ecology. We also discuss lessons learned from HLS in the general context of implementing virtual constellations.

Harmonized Landsat/Sentinel-2 Reflectance Products for Land Monitoring

NASA Astrophysics Data System (ADS)

Masek, J. G.; Ju, J.; Claverie, M.; Vermote, E.; Dungan, J. L.; Roger, J. C.; Skakun, S.; Justice, C. O.

2017-12-01

Many land applications require more frequent observations than can be obtained from a single "Landsat class" sensor. Agricultural monitoring, inland water quality assessment, stand-scale phenology, and numerous other applications all require near-daily imagery at better than 1ha resolution. Thus the land science community has begun expressing a desire for a "30-meter MODIS" global monitoring capability. One cost-effective way to achieve this goal is via merging data from multiple, international observatories into a single virtual constellation. The Harmonized Landsat/Sentinel-2 (HLS) project has been working to generate a seamless surface reflectance product by combining observations from USGS/NASA Landsat-8 and ESA Sentinel-2. Harmonization in this context requires a series of radiometric and geometric transforms to create a single surface reflectance time series agnostic to sensor origin. Radiometric corrections include a common atmospheric correction using the Landsat-8 LaSRC/6S approach, a simple BRDF adjustment to constant solar and nadir view angle, and spectral bandpass adjustments to fit the Landsat-8 OLI reference. Data are then resampled to a consistent 30m UTM grid, using the Sentinel-2 global tile system. Cloud and shadow masking are also implemented. Quality assurance (QA) involves comparison of the output 30m HLS products with near-simultaneous MODIS nadir-adjusted observations. Prototoype HLS products have been processed for 7% of the global land area using the NASA Earth Exchange (NEX) compute environment at NASA Ames, and can be downloaded from the HLS web site (https://hls.gsfc.nasa.gov). A wall-to-wall North America data set is being prepared for 2018.This talk will review the objectives and status of the HLS project, and illustrate applications of high-density optical time series data for agriculture and ecology. We also discuss lessons learned from HLS in the general context of implementing virtual constellations.

Soft x-ray reduction camera for submicron lithography

DOEpatents

Hawryluk, Andrew M.; Seppala, Lynn G.

1991-01-01

Soft x-ray projection lithography can be performed using x-ray optical components and spherical imaging lenses (mirrors), which form an x-ray reduction camera. The x-ray reduction is capable of projecting a 5x demagnified image of a mask onto a resist coated wafer using 4.5 nm radiation. The diffraction limited resolution of this design is about 135 nm with a depth of field of about 2.8 microns and a field of view of 0.2 cm.sup.2. X-ray reflecting masks (patterned x-ray multilayer mirrors) which are fabricated on thick substrates and can be made relatively distortion free are used, with a laser produced plasma for the source. Higher resolution and/or larger areas are possible by varying the optic figures of the components and source characteristics.

Reflective optical imaging system with balanced distortion

DOEpatents

Chapman, Henry N.; Hudyma, Russell M.; Shafer, David R.; Sweeney, Donald W.

1999-01-01

An optical system compatible with short wavelength (extreme ultraviolet) An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four reflective elements for projecting a mask image onto a substrate. The four optical elements comprise, in order from object to image, convex, concave, convex and concave mirrors. The optical system is particularly suited for step and scan lithography methods. The invention enables the use of larger slit dimensions associated with ring field scanning optics, improves wafer throughput and allows higher semiconductor device density. The inventive optical system is characterized by reduced dynamic distortion because the static distortion is balanced across the slit width.

Compact multi-bounce projection system for extreme ultraviolet projection lithography

DOEpatents

Hudyma, Russell M.

2002-01-01

An optical system compatible with short wavelength (extreme ultraviolet) radiation comprising four optical elements providing five reflective surfaces for projecting a mask image onto a substrate. The five optical surfaces are characterized in order from object to image as concave, convex, concave, convex and concave mirrors. The second and fourth reflective surfaces are part of the same optical element. The optical system is particularly suited for ring field step and scan lithography methods. The invention uses aspheric mirrors to minimize static distortion and balance the static distortion across the ring field width, which effectively minimizes dynamic distortion.

Douglas MacArthur Upon Reflection

DTIC Science & Technology

1998-04-01

to hide her insecurities behind a mask of authoritarian control. Second, the child discerned maternal desires with uncanny sensitivity and fidelity...narcissist.5 Among Miller’s narcissistic adult patients who once were gifted children, their maternal relationships uniformly manifested three...to accomplish his assigned role. Third, the gifted child secured maternal “love” by fulfilling his role as admirable offspring bolstering his fragile

"Why Do You Make Me Hate Myself?": Re-Teaching Whiteness, Abuse, and Love in Urban Teacher Education

ERIC Educational Resources Information Center

Matias, Cheryl E.

2016-01-01

Teacher educators are constantly trying to improve the field to meet the needs of a growing urban populace. Inclusion of socially just philosophies in the curriculum is indeed essential, yet it can mask the recycling of normalized, oppressive Whiteness. This reflective and theoretical paper employs critical race theory and critical Whiteness…

Task difficulty differentially affects two measures of processing load: the pupil response during sentence processing and delayed cued recall of the sentences.

PubMed

Zekveld, Adriana A; Festen, Joost M; Kramer, Sophia E

2013-08-01

In this study, the authors assessed the influence of masking level (29% or 71% sentence perception) and test modality on the processing load during language perception as reflected by the pupil response. In addition, the authors administered a delayed cued stimulus recall test to examine whether processing load affected the encoding of the stimuli in memory. Participants performed speech and text reception threshold tests, during which the pupil response was measured. In the cued recall test, the first half of correctly perceived sentences was presented, and participants were asked to complete the sentences. Reading and listening span tests of working memory capacity were presented as well. Regardless of test modality, the pupil response indicated higher processing load in the 29% condition than in the 71% correct condition. Cued recall was better for the 29% condition. The consistent effect of masking level on the pupil response during listening and reading support the validity of the pupil response as a measure of processing load during language perception. The absent relation between pupil response and cued recall may suggest that cued recall is not directly related to processing load, as reflected by the pupil response.

Discriminating heavy aerosol, clouds, and fires during SCAR-B: Application of airborne multispectral MAS data

NASA Astrophysics Data System (ADS)

King, Michael D.; Tsay, Si-Chee; Ackerman, Steven A.; Larsen, North F.

1998-12-01

A multispectral scanning spectrometer was used to obtain measurements of the reflection function and brightness temperature of smoke, clouds, and terrestrial surfaces at 50 discrete wavelengths between 0.55 and 14.2 μm. These observations were obtained from the NASA ER-2 aircraft as part of the Smoke, Clouds, and Radiation-Brazil (SCAR-B) campaign, conducted over a 1500×1500 km region of cerrado and rain forest throughout Brazil between August 16 and September 11, 1995. Multispectral images of the reflection function and brightness temperature in 10 distinct bands of the MODIS airborne simulator (MAS) were used to derive a confidence in clear sky (or alternatively the probability of cloud), shadow, fire, and heavy aerosol. In addition to multispectral imagery, monostatic lidar data were obtained along the nadir ground track of the aircraft and used to assess the accuracy of the cloud mask results. This analysis shows that the cloud and aerosol mask being developed for operational use on the moderate-resolution imaging spectroradiometer (MODIS), and tested using MAS data in Brazil, is quite capable of separating cloud, aerosol, shadow, and fires during daytime conditions over land.

Extreme ultraviolet lithography machine

DOEpatents

Tichenor, Daniel A.; Kubiak, Glenn D.; Haney, Steven J.; Sweeney, Donald W.

2000-01-01

An extreme ultraviolet lithography (EUVL) machine or system for producing integrated circuit (IC) components, such as transistors, formed on a substrate. The EUVL machine utilizes a laser plasma point source directed via an optical arrangement onto a mask or reticle which is reflected by a multiple mirror system onto the substrate or target. The EUVL machine operates in the 10-14 nm wavelength soft x-ray photon. Basically the EUV machine includes an evacuated source chamber, an evacuated main or project chamber interconnected by a transport tube arrangement, wherein a laser beam is directed into a plasma generator which produces an illumination beam which is directed by optics from the source chamber through the connecting tube, into the projection chamber, and onto the reticle or mask, from which a patterned beam is reflected by optics in a projection optics (PO) box mounted in the main or projection chamber onto the substrate. In one embodiment of a EUVL machine, nine optical components are utilized, with four of the optical components located in the PO box. The main or projection chamber includes vibration isolators for the PO box and a vibration isolator mounting for the substrate, with the main or projection chamber being mounted on a support structure and being isolated.

Relativistic Effects on Reflection X-ray Spectra of AGN

DOE Office of Scientific and Technical Information (OSTI.GOV)

Lee, Khee-Gan; /University Coll. London; Fuerst, Steven V.

2007-01-05

We have calculated the reflection component of the X-ray spectra of active galactic nuclei (AGN) and shown that they can be significantly modified by the relativistic motion of the accretion flow and various gravitational effects of the central black hole. The absorption edges in the reflection spectra suffer severe energy shifts and smearing. The degree of distortion depends on the system parameters, and the dependence is stronger for some parameters such as the inner radius of the accretion disk and the disk viewing inclination angles. The relativistic effects are significant and are observable. Improper treatment of the reflection component ofmore » the X-ray continuum in spectral fittings will give rise to spurious line-like features, which will mimic the fluorescent emission lines and mask the relativistic signatures of the lines.« less

Optical Evaluation of DMDs with UV-Grade FS, Sapphire, MgF2 Windows and Reflectance of Bare Devices

NASA Technical Reports Server (NTRS)

Quijada, Manuel A.; Heap, Sara; Travinsky, Anton; Vorobiev, Dmitry; Ninkov, Zoran; Raisanen, Alan; Roberto, Massimo

2016-01-01

Digital Micro-mirror Devices (DMDs) have been identified as an alternative to microshutter arrays for space-based multi-object spectrometers (MOS). Specifically, the MOS at the heart of a proposed Galactic Evolution Spectroscopic Explorer (GESE) that uses the DMD as a reprogrammable slit mask. Unfortunately, the protective borosilicate windows limit the use of DMDs in the UV and IR regimes, where the glass has insufficient throughput. In this work, we present our efforts to replace standard DMD windows with custom windows made from UV-grade fused silica, Low Absorption Optical Sapphire (LAOS) and magnesium fluoride. We present reflectance measurements of the antireflection coated windows and a reflectance study of the DMDs active area (window removed). Furthermore, we investigated the long-term stability of the DMD reflectance and recoating device with fresh Al coatings.

Fabrication et applications des reseaux de Bragg ultra-longs

NASA Astrophysics Data System (ADS)

Gagne, Mathieu

This thesis presents the principal accomplishments realized during the PhD project. The thesis is presented by publication format and is a collection of four published articles having fiber Bragg gratings as a central theme. First achieved in 1978, UV writing of fiber Bragg gratings is nowadays a common and mature technology being present in both industry and academia. The property of reflecting light guided by optical fibers lead to diverse applications in telecommunication, lasers as well as several types of sensors. The conventional fabrication technique is generally based on the use of generally expensive phase masks which determine the obtained characteristics of the fiber Bragg grating. The fiber being photosensitive at those wavelengths, a periodic pattern can be written into it. The maximal length, the period, the chirp, the index contrast and the apodisation are all characteristics that depend on the phase mask. The first objective of the research project is to be able to go beyond this strong dependance on the phase mask without deteriorating grating quality. This is what really sets apart the technique presented in this thesis from other long fiber Bragg grating fabrication techniques available in the literature. The fundamental approach to obtain ultra long fiber Bragg gratings of arbitrary profile is to replace the scheme of scanning a UV beam across a phase mask to expose a fixed fiber by a scheme where the UV beam and phase mask are fixed and where the fiber is moving instead. To obtain a periodic index variation, the interference pattern itself must be synchronized with the moving fiber. Two variations of this scheme were implanted: the first one using electro-optical phase modulator placed in each arm of a Talbot interferometer and the second one using a phase mask mounted on a piezo electric actuator. A new scheme that imparts fine movements of the interferometer is also implemented for the first time and showed to be essential to achieve high quality ultra long fiber Bragg gratings. High quality theory matching ultra long fiber Bragg gratings up to 1 meter long are obtained for the first time. The possibility of fabricating high quality ultra long fiber Bragg grating of more than 10 cm (approximately the maximal phase mask length) opens a variety of new applications otherwise impossible with short fiber Bragg grating technology. Ultra long fiber Bragg gratings have unique characteristics such as high reflectivity, high dispersion and ultra narrow bandwidth. Those characteristics can be used to do advanced signal processing, non linear propagation experiments, distributed feedback fiber lasers and dispersion compensator for telecommunication or optical tomography. The second objective of this project is to use these ultra-long fiber Bragg gratings as an optical cavity for fiber lasers. Alot of research in the past years have been concentrated on those lasers, particularly on distributed feedback fiber lasers where the gratings spans all the gain media. A new random fiber laser configuration is presented. It is based on passive or active insertion of phase shifts along the Bragg grating to obtained a phenomenon called light localization which is the optical equivalent of Anderson localization. This complex wave phenomenon has the unique property to mimic the reflection of a uniform photonic crystal with the random diffusion of light among the elements of a random media. Being commonly obtained in fine powders which must respect a certain set of rules, the realization of 1D structures is vastly simplified in optical fibers. Two random fiber laser schemes based on light localization, one using erbium dopant and the other one Raman scattering, are demonstrated for the first time and compared to traditional distributed feedback fiber lasers.

High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond

NASA Astrophysics Data System (ADS)

Schoot, Jan van; Setten, Eelco van; Rispens, Gijsbert; Troost, Kars Z.; Kneer, Bernhard; Migura, Sascha; Neumann, Jens Timo; Kaiser, Winfried

2017-10-01

Current extreme ultraviolet (EUV) projection lithography systems exploit a projection lens with a numerical aperture (NA) of 0.33. It is expected that these will be used in mass production in the 2018/2019 timeframe. By then, the most difficult layers at the 7-nm logic and the mid-10-nm DRAM nodes will be exposed. These systems are a more economical alternative to multiple-exposure by 193 argon fluoride immersion scanners. To enable cost-effective shrink by EUV lithography down to 8-nm half pitch, a considerably larger NA is needed. As a result of the increased NA, the incidence angles of the light rays at the mask increase significantly. Consequently, the shadowing and the variation of the multilayer reflectivity deteriorate the aerial image contrast to unacceptably low values at the current 4× magnification. The only solution to reduce the angular range at the mask is to increase the magnification. Simulations show that the magnification has to be doubled to 8× to overcome the shadowing effects. Assuming that the mask infrastructure will not change the mask form factor, this would inevitably lead to a field size that is a quarter of the field size of the current 0.33-NA step and scan systems and reduce the throughput (TPT) of the high-NA scanner to a value below 100 wafers per hour unless additional measures are taken. This paper presents an anamorphic step and scan system capable of printing fields that are half the field size of the current full field. The anamorphic system has the potential to achieve a TPT in excess of 150 wafers per hour by increasing the transmission of the optics, as well as increasing the acceleration of the wafer stage and mask stage. This makes it an economically viable lithography solution.

An Automatic Cloud Mask Algorithm Based on Time Series of MODIS Measurements

NASA Technical Reports Server (NTRS)

Lyapustin, Alexei; Wang, Yujie; Frey, R.

2008-01-01

Quality of aerosol retrievals and atmospheric correction depends strongly on accuracy of the cloud mask (CM) algorithm. The heritage CM algorithms developed for AVHRR and MODIS use the latest sensor measurements of spectral reflectance and brightness temperature and perform processing at the pixel level. The algorithms are threshold-based and empirically tuned. They don't explicitly address the classical problem of cloud search, wherein the baseline clear-skies scene is defined for comparison. Here, we report on a new CM algorithm which explicitly builds and maintains a reference clear-skies image of the surface (refcm) using a time series of MODIS measurements. The new algorithm, developed as part of the Multi-Angle Implementation of Atmospheric Correction (MAIAC) algorithm for MODIS, relies on fact that clear-skies images of the same surface area have a common textural pattern, defined by the surface topography, boundaries of rivers and lakes, distribution of soils and vegetation etc. This pattern changes slowly given the daily rate of global Earth observations, whereas clouds introduce high-frequency random disturbances. Under clear skies, consecutive gridded images of the same surface area have a high covariance, whereas in presence of clouds covariance is usually low. This idea is central to initialization of refcm which is used to derive cloud mask in combination with spectral and brightness temperature tests. The refcm is continuously updated with the latest clear-skies MODIS measurements, thus adapting to seasonal and rapid surface changes. The algorithm is enhanced by an internal dynamic land-water-snow classification coupled with a surface change mask. An initial comparison shows that the new algorithm offers the potential to perform better than the MODIS MOD35 cloud mask in situations where the land surface is changing rapidly, and over Earth regions covered by snow and ice.

VAMPIRES: probing the innermost regions of protoplanetary systems with polarimetric aperture-masking

NASA Astrophysics Data System (ADS)

Norris, Barnaby R. M.; Tuthill, Peter G.; Jovanovic, Nemanja; Schworer, Guillaume; Guyon, Olivier; Martinache, Frantz; Stewart, Paul N.

2014-07-01

VAMPIRES is a high-angular resolution imager developed to directly image planet-forming circumstellar disks, and the signatures of forming planets that lie within. The instrument leverages aperture masking interferometry - providing diffraction-limited imaging despite seeing - in combination with fast-switching differential polarimetry to directly image structure in the inner-most regions of protoplanetary systems. VAMPIRES will use starlight scattered by dust in such systems to precisely map the disk, gaps, knots and waves that are key to understanding disk evolution and planet formation. It also promises to image the dusty circumstellar environments of AGB stars. This instrument perfectly compliments coronagraphic observations in the near-IR, and can operate simultaneously with a coronagraph, as part of the SCExAO extreme-AO system at the Subaru telescope. In this paper the design of the instrument will be presented, along with an explanation of the unique data analysis process and the results of the first on-sky tests.

Bottom-up photonic crystal cavities formed by patterned III-V nanopillars.

PubMed

Scofield, Adam C; Shapiro, Joshua N; Lin, Andrew; Williams, Alex D; Wong, Ping-Show; Liang, Baolai L; Huffaker, Diana L

2011-06-08

We report on the formation and optical properties of bottom-up photonic crystal (PC) cavities formed by III-V nanopillars (NPs) via catalyst-free selective-area metal-organic chemical vapor deposition on masked GaAs substrates. This method of NP synthesis allows for precise lithographic control of NP position and diameter enabling simultaneous formation of both the photonic band gap (PBG) region and active gain region. The PBG and cavity resonance are determined by independently tuning the NP radius r, pitch a, and height h in the respective masked areas. Near-infrared emission at 970 nm is achieved from axial GaAs/InGaAs heterostructures with in situ passivation by laterally grown InGaP shells. To achieve out-of-plane optical confinement, the PC cavities are embedded in polydimethylsiloxane (PDMS) and removed from the growth substrate. Spatially and spectrally resolved 77 K photoluminescence demonstrates a strong influence of the PBG resonance on device emission. Resonant peaks are observed in the emission spectra of PC cavities embedded in PDMS.

Cloud Retrieval Intercomparisons Between SEVIRI, MODIS and VIIRS with CHIMAERA PGE06 Data Collection 6 Products

NASA Technical Reports Server (NTRS)

Wind, Galina; Riedi, Jerome; Platnick, Steven; Heidinger, Andrew

2014-01-01

The Cross-platform HIgh resolution Multi-instrument AtmosphEric Retrieval Algorithms (CHIMAERA) system allows us to perform MODIS-like cloud top, optical and microphysical properties retrievals on any sensor that possesses a minimum set of common spectral channels. The CHIMAERA system uses a shared-core architecture that takes retrieval method out of the equation when intercomparisons are made. Here we show an example of such retrieval and a comparison of simultaneous retrievals done using SEVIRI, MODIS and VIIRS sensors. All sensor retrievals are performed using CLAVR-x (or CLAVR-x based) cloud top properties algorithm. SEVIRI uses the SAF_NWC cloud mask. MODIS and VIIRS use the IFF-based cloud mask that is a shared algorithm between MODIS and VIIRS. The MODIS and VIIRS retrievals are performed using a VIIRS branch of CHIMAERA that limits available MODIS channel set. Even though in that mode certain MODIS products such as multilayer cloud map are not available, the cloud retrieval remains fully equivalent to operational Data Collection 6.

Optical image encryption scheme with multiple light paths based on compressive ghost imaging

NASA Astrophysics Data System (ADS)

Zhu, Jinan; Yang, Xiulun; Meng, Xiangfeng; Wang, Yurong; Yin, Yongkai; Sun, Xiaowen; Dong, Guoyan

2018-02-01

An optical image encryption method with multiple light paths is proposed based on compressive ghost imaging. In the encryption process, M random phase-only masks (POMs) are generated by means of logistic map algorithm, and these masks are then uploaded to the spatial light modulator (SLM). The collimated laser light is divided into several beams by beam splitters as it passes through the SLM, and the light beams illuminate the secret images, which are converted into sparse images by discrete wavelet transform beforehand. Thus, the secret images are simultaneously encrypted into intensity vectors by ghost imaging. The distances between the SLM and secret images vary and can be used as the main keys with original POM and the logistic map algorithm coefficient in the decryption process. In the proposed method, the storage space can be significantly decreased and the security of the system can be improved. The feasibility, security and robustness of the method are further analysed through computer simulations.

"Crypto-Display" in Dual-Mode Metasurfaces by Simultaneous Control of Phase and Spectral Responses.

PubMed

Yoon, Gwanho; Lee, Dasol; Nam, Ki Tae; Rho, Junsuk

2018-06-26

Although conventional metasurfaces have demonstrated many promising functionalities in light control by tailoring either phase or spectral responses of subwavelength structures, simultaneous control of both responses has not been explored yet. Here, we propose a concept of dual-mode metasurfaces that enables simultaneous control of phase and spectral responses for two kinds of operation modes of transmission and reflection, respectively. In the transmission mode, the dual-mode metasurface acts as conventional metasurfaces by tailoring phase distribution of incident light. In the reflection mode, a reflected colored image is produced under white light illumination. We also experimentally demonstrate a crypto-display as one application of the dual-mode metasurface. The crypto-display looks a normal reflective display under white light illumination but generates a hologram that reveals the encrypted phase information under single-wavelength coherent light illumination. Because two operation modes do not affect each other, the crypto-display can have applications in security techniques.

Coordinated analyses of orbital and spirit rover data to characterize surface materials on the cratered plains of Gusev Crater, Mars

USGS Publications Warehouse

Lichtenberg, K.A.; Arvidson, R. E.; Poulet, F.; Morris, R.V.; Knudson, A.; Bell, J.F.; Bellucci, G.; Bibring, J.-P.; Farrand, W. H.; Johnson, J. R.; Ming, D. W.; Pinet, P.C.; Rogers, A.D.; Squyres, S. W.

2007-01-01

Comparison of the Mars Exploration Rover Spirit's Pancam (0.4 to 1.0 ??m) and Mars Express Observatoire pour la Mineralogie l'Eau, les Glaces et l'Activite?? (OMEGA) (0.4 to 2.5 ??m) spectral reflectance data over Spirit's traverses shows that Gusev cratered plains are dominated by nanophase ferric-oxide-rich dust covering weakly altered basaltic sands. This interpretation is also consistent with both observations from OMEGA data covering plains beyond the traverse region and interpretations of data from the other payload instruments on the Spirit Rover. OMEGA observations of relatively low albedo regions where dust has presumably been stripped by dust devils show negative spectral reflectance slopes from 1.5 to 2.5 ??m and moderately masked spectral features which are indicative of olivine or pyroxene. High-albedo regions north and south of the Spirit landing site have flat spectral reflectance slopes and few spectral features, although all spectra have a nanophase ferric-oxide absorption edge between 0.4 and 0.75 ??m. Comparison of THEMIS-derived thermal inertia values with OMEGA-derived spectral parameters shows that although the dust cover can be optically thick (0.4 to 2.5 ??m wavelength region) in some areas, it is not thick enough (???1 cm) to mask the thermal inertia of the underlying substrate for areas included in this study. Copyright 2007 by the American Geophysical Union.

A simulation framework for auditory discrimination experiments: Revealing the importance of across-frequency processing in speech perception.

PubMed

Schädler, Marc René; Warzybok, Anna; Ewert, Stephan D; Kollmeier, Birger

2016-05-01

A framework for simulating auditory discrimination experiments, based on an approach from Schädler, Warzybok, Hochmuth, and Kollmeier [(2015). Int. J. Audiol. 54, 100-107] which was originally designed to predict speech recognition thresholds, is extended to also predict psychoacoustic thresholds. The proposed framework is used to assess the suitability of different auditory-inspired feature sets for a range of auditory discrimination experiments that included psychoacoustic as well as speech recognition experiments in noise. The considered experiments were 2 kHz tone-in-broadband-noise simultaneous masking depending on the tone length, spectral masking with simultaneously presented tone signals and narrow-band noise maskers, and German Matrix sentence test reception threshold in stationary and modulated noise. The employed feature sets included spectro-temporal Gabor filter bank features, Mel-frequency cepstral coefficients, logarithmically scaled Mel-spectrograms, and the internal representation of the Perception Model from Dau, Kollmeier, and Kohlrausch [(1997). J. Acoust. Soc. Am. 102(5), 2892-2905]. The proposed framework was successfully employed to simulate all experiments with a common parameter set and obtain objective thresholds with less assumptions compared to traditional modeling approaches. Depending on the feature set, the simulated reference-free thresholds were found to agree with-and hence to predict-empirical data from the literature. Across-frequency processing was found to be crucial to accurately model the lower speech reception threshold in modulated noise conditions than in stationary noise conditions.

Effective masking levels for 500 and 2000 Hz bone conduction auditory steady state responses in infants and adults with normal hearing.

PubMed

Small, Susan A; Smyth, Aisling; Leon, Griselle

2014-01-01

Few studies have investigated effective masking levels (EMLs) needed to isolate the test ear for bone conduction assessments in infants. The objective of this study was to determine EMLs for 500 and 2000 Hz bone conduction auditory steady state responses (ASSRs) to amplitude (AM)/frequency-modulated (FM) stimuli for infants and adults with normal hearing. Maturational factors that contribute to infant-adult differences in EMLs will also be investigated. The present study and previously published 1000 and 4000 Hz EML data will be compared to investigate EML across four frequencies. These findings will provide a starting point for implementing clinical masking for infant bone conduction testing using physiological measures. Participants were 15 infants (7 to 35 weeks) and 15 adults (21 to 56 years) with normal hearing. Bone-conducted single ASSR stimuli (research MASTER) were 100% AM and 25% FM at 85 and 101 Hz for 500 and 2000 Hz carrier frequencies, respectively. They were presented at 25 and 35 dB HL for 500 Hz and at 35 and 45 dB HL for 2000 Hz for both infants and adults (approximately 10 and 20 dB SL at each frequency for infants). Air-conducted narrowband maskers were presented to both ears simultaneously. Real-ear to coupler differences were measured to account for differences in the sound pressure developed in infant and adult ear canals as a result of ear-canal size. Data analyses were conducted for mean EMLs across frequency (500 to 4000 Hz) and between age groups. Masked and unmasked ASSR amplitudes were compared for 500 and 2000 Hz. Both infants and adults required much more masking (25 to 33 dB) to eliminate responses at 500 compared with 2000 Hz. On average, infants required 16 dB more masking at 500 Hz and similar amounts of masking at 2000 Hz compared with adults. When adjusted for ear-canal size and bone conduction sensitivity, the pattern of results did not change. Across all four frequencies, infants showed a systematic decrease in mean EMLs with an increase in frequency; all pair-wise comparisons were significant except 2000 versus 4000 Hz. Adults showed smaller frequency-dependent changes in EML (only significantly greater for 500 versus 2000 Hz and 4000 Hz). When ear-canal size and bone conduction sensitivity were taken into account, only 500 Hz required more masking than other frequencies in infants; there were no significant frequency-dependent trends for adults, although the greater EMLs at 1000 versus 2000 Hz and 4000 Hz approached significance. Unmasked and masked amplitudes tended to be larger for 2000 Hz but not for 500 Hz when comparing infants with adults. EMLs appropriate for infants for bone conduction ASSRs elicited to AM/FM stimuli are considerably higher at 500 compared with 2000 Hz. Infants also need more masking at 500 Hz compared with adults but the same amount of masking at 2000 Hz. Comparisons across four frequencies reveal a systematic decrease in EML with an increase in frequency in infants, which is not apparent in adults. Recommended EMLs for AM/FM bone-conducted ASSR stimuli presented at 35 dB HL for 500, 1000, 2000, and 4000 Hz, respectively, are: (1) infants: 81, 68, 59, and 45 dB SPL, and (2) adults: 66, 63, 59, and 55 dB SPL.

Masking of sounds by a background noise--cochlear mechanical correlates.

PubMed

Recio-Spinoso, Alberto; Cooper, Nigel P

2013-05-15

In the search for cochlear correlates of auditory masking by noise stimuli, we recorded basilar membrane (BM) vibrations evoked by either tone or click signals in the presence of varying levels of background noise. The BM vibrations were recorded from basal regions in healthy cochleae of anaesthetized chinchilla and gerbil. Non-linear interactions that could underpin various aspects of psychophysical masking data, including both compression and suppression at the BM level, were observed. The suppression effects, whereby the amplitude of the responses to each stimulus component could be reduced, depended on the relative intensities of the noise and the tones or clicks. Only stimulus components whose frequencies fell inside the non-linear region of the recording site, i.e. around its characteristic frequency (CF), were affected by presentation of the 'suppressing' stimulus (which could be either the tone or the noise). Mutual suppression, the simultaneous reduction of the responses to both tones and noise components, was observed under some conditions, but overall reductions of BM vibration were rarely observed. Moderate- to high-intensity tones suppressed BM responses to low-intensity Gaussian stimuli, including both broadband and narrowband noise. Suppression effects were larger for spectral components of the noise response that were closer to the CF. In this regime, the tone and noise stimuli became the suppressor and probe signals, respectively. This study provides the first detailed observations of cochlear mechanical correlates of the masking effects of noise. Mechanical detection thresholds for tone signals, which were arbitrarily defined using three criteria, are shown to increase in almost direct proportion to the noise level for low and moderately high noise levels, in a manner that resembles the findings of numerous psychophysical observations.

Masking of sounds by a background noise – cochlear mechanical correlates

PubMed Central

Recio-Spinoso, Alberto; Cooper, Nigel P

2013-01-01

In the search for cochlear correlates of auditory masking by noise stimuli, we recorded basilar membrane (BM) vibrations evoked by either tone or click signals in the presence of varying levels of background noise. The BM vibrations were recorded from basal regions in healthy cochleae of anaesthetized chinchilla and gerbil. Non-linear interactions that could underpin various aspects of psychophysical masking data, including both compression and suppression at the BM level, were observed. The suppression effects, whereby the amplitude of the responses to each stimulus component could be reduced, depended on the relative intensities of the noise and the tones or clicks. Only stimulus components whose frequencies fell inside the non-linear region of the recording site, i.e. around its characteristic frequency (CF), were affected by presentation of the ‘suppressing’ stimulus (which could be either the tone or the noise). Mutual suppression, the simultaneous reduction of the responses to both tones and noise components, was observed under some conditions, but overall reductions of BM vibration were rarely observed. Moderate- to high-intensity tones suppressed BM responses to low-intensity Gaussian stimuli, including both broadband and narrowband noise. Suppression effects were larger for spectral components of the noise response that were closer to the CF. In this regime, the tone and noise stimuli became the suppressor and probe signals, respectively. This study provides the first detailed observations of cochlear mechanical correlates of the masking effects of noise. Mechanical detection thresholds for tone signals, which were arbitrarily defined using three criteria, are shown to increase in almost direct proportion to the noise level for low and moderately high noise levels, in a manner that resembles the findings of numerous psychophysical observations. PMID:23478137

On the origin of increased sensitivity and mass resolution using silicon masks in MALDI.

PubMed

Diologent, Laurent; Franck, Julien; Wisztorski, Maxence; Treizebre, Anthony; Focsa, Cristian; Fournier, Isabelle; Ziskind, Michael

2014-02-04

Since its development, MALDI has proved its performance in the analysis of intact biomolecules up to high molecular weights, regardless of their polarity. Sensitivity of MALDI instruments is a key point for breaking the limits of observing biomolecules of lower abundances. Instrumentation is one way to improve sensitivity by increasing ion transmission and using more sensitive detection systems. On the other side, improving MALDI ion production yields would have important outcomes. MALDI ion production is still not well-controlled and, indeed, the amount of ions produced per laser shot with respect to the total volume of desorbed material is very low. This has particular implications for certain applications, such as MALDI MS imaging where laser beam focusing as fine as possible (5-10 μm) is searched in order to reach higher spatial resolution images. However, various studies point out an intrinsic decrease in signal intensity for strong focusing. We have therefore been interested in developing silicon mask systems to decrease an irradiated area by cutting rather than focusing the laser beam and to study the parameters affecting sensitivity using such systems. For this, we systematically examined variation with laser fluence of intensity and spectral resolution in MALDI of standard peptides when using silicon-etched masks of various aperture sizes. These studies demonstrate a simultaneous increase in spectral resolution and signal intensity. Origin of this effect is discussed in the frame of the two-step ionization model. Experimental data in the low fluence range are fitted with an increase of the primary ionization through matrix-silicon edge contact provided by the masks. On the other hand, behavior at higher fluence could be explained by an effect on the secondary ionization via changes in the plume dynamics.

A novel approach: high resolution inspection with wafer plane defect detection

NASA Astrophysics Data System (ADS)

Hess, Carl; Wihl, Mark; Shi, Rui-fang; Xiong, Yalin; Pang, Song

2008-05-01

High Resolution reticle inspection is well-established as a proven, effective, and efficient means of detecting yield-limiting mask defects as well as defects which are not immediately yield-limiting yet can enable manufacturing process improvements. Historically, RAPID products have enabled detection of both classes of these defects. The newly-developed Wafer Plane Inspection (WPI) detector technology meets the needs of some advanced mask manufacturers to identify the lithographically-significant defects while ignoring the other non-lithographically-significant defects. Wafer Plane Inspection accomplishes this goal by performing defect detection based on a modeled image of how the mask features would actually print in the photoresist. This has the effect of reducing sensitivity to non-printing defects while enabling higher sensitivity focused in high MEEF areas where small reticle defects still yield significant printing defects on wafers. WPI is a new inspection mode that has been developed by KLA-Tencor and is currently under test with multiple customers. It employs the same transmitted and reflected-light high-resolution images as the industry-standard high-resolution inspections, but with much more sophisticated processing involved. A rigorous mask pattern recovery algorithm is used to convert the transmitted and reflected light images into a modeled representation of the reticle. Lithographic modeling of the scanner is then used to generate an aerial image of the mask. This is followed by resist modeling to determine the exposure of the photoresist. The defect detectors are then applied on this photoresist plane so that only printing defects are detected. Note that no hardware modifications to the inspection system are required to enable this detector. The same tool will be able to perform both our standard High Resolution inspections and the Wafer Plane Inspection detector. This approach has several important features. The ability to ignore non-printing defects and to apply additional effective sensitivity in high MEEF areas enables advanced node development. In addition, the modeling allows the inclusion of important polarization effects that occur in the resist for high NA operation. This allows for the results to better match wafer print results compared to alternate approaches. Finally, the simulation easily allows for the application of arbitrary illumination profiles. With this approach, users of WPI can make use of unique or custom scanner illumination profiles. This allows the more precise modeling of profiles without inspection system hardware modification or loss of company intellectual property. This paper examines WPI in Die:Die mode. Future work includes a review of Die:Database WPI capability.

Layout optimization of DRAM cells using rigorous simulation model for NTD

NASA Astrophysics Data System (ADS)

Jeon, Jinhyuck; Kim, Shinyoung; Park, Chanha; Yang, Hyunjo; Yim, Donggyu; Kuechler, Bernd; Zimmermann, Rainer; Muelders, Thomas; Klostermann, Ulrich; Schmoeller, Thomas; Do, Mun-hoe; Choi, Jung-Hoe

2014-03-01

DRAM chip space is mainly determined by the size of the memory cell array patterns which consist of periodic memory cell features and edges of the periodic array. Resolution Enhancement Techniques (RET) are used to optimize the periodic pattern process performance. Computational Lithography such as source mask optimization (SMO) to find the optimal off axis illumination and optical proximity correction (OPC) combined with model based SRAF placement are applied to print patterns on target. For 20nm Memory Cell optimization we see challenges that demand additional tool competence for layout optimization. The first challenge is a memory core pattern of brick-wall type with a k1 of 0.28, so it allows only two spectral beams to interfere. We will show how to analytically derive the only valid geometrically limited source. Another consequence of two-beam interference limitation is a "super stable" core pattern, with the advantage of high depth of focus (DoF) but also low sensitivity to proximity corrections or changes of contact aspect ratio. This makes an array edge correction very difficult. The edge can be the most critical pattern since it forms the transition from the very stable regime of periodic patterns to non-periodic periphery, so it combines the most critical pitch and highest susceptibility to defocus. Above challenge makes the layout correction to a complex optimization task demanding a layout optimization that finds a solution with optimal process stability taking into account DoF, exposure dose latitude (EL), mask error enhancement factor (MEEF) and mask manufacturability constraints. This can only be achieved by simultaneously considering all criteria while placing and sizing SRAFs and main mask features. The second challenge is the use of a negative tone development (NTD) type resist, which has a strong resist effect and is difficult to characterize experimentally due to negative resist profile taper angles that perturb CD at bottom characterization by scanning electron microscope (SEM) measurements. High resist impact and difficult model data acquisition demand for a simulation model that hat is capable of extrapolating reliably beyond its calibration dataset. We use rigorous simulation models to provide that predictive performance. We have discussed the need of a rigorous mask optimization process for DRAM contact cell layout yielding mask layouts that are optimal in process performance, mask manufacturability and accuracy. In this paper, we have shown the step by step process from analytical illumination source derivation, a NTD and application tailored model calibration to layout optimization such as OPC and SRAF placement. Finally the work has been verified with simulation and experimental results on wafer.

2014 Code of Practice: How Research Evidence on the Role and Impact of Teaching Assistants Can Inform Professional Practice

ERIC Educational Resources Information Center

Webster, Rob

2014-01-01

In this article, the author reflects on findings from research on the role and impact of teaching assistants and experience of working as a special educational needs (SEN) officer. Research evidence suggests the reliance on teaching assistants to include pupils with Statements of SEN in mainstream settings masks a collective, though unintentional,…

Task Difficulty Differentially Affects Two Measures of Processing Load: The Pupil Response during Sentence Processing and Delayed Cued Recall of the Sentences

ERIC Educational Resources Information Center

Zekveld, Adriana A.; Festen, Joost M.; Kramer, Kramera

2013-01-01

Purpose: In this study, the authors assessed the influence of masking level (29% or 71% sentence perception) and test modality on the processing load during language perception as reflected by the pupil response. In addition, the authors administered a delayed cued stimulus recall test to examine whether processing load affected the encoding of…

Gender Differences in Neural Responses to Perceptually Invisible Fearful Face—An ERP Study

PubMed Central

Lee, Seung A.; Kim, Chai-Youn; Shim, Miseon; Lee, Seung-Hwan

2017-01-01

Women tend to respond to emotional stimuli differently from men. This study aimed at investigating whether neural responses to perceptually “invisible” emotional stimuli differ between men and women by exploiting event-related potential (ERP). Forty healthy participants (21 women) were recruited for the main experiment. A control experiment was conducted by excluding nine (7 women) participants from the main experiment and replacing them with additional ten (6 women) participants (total 41 participants) where Beck's Anxiety Inventory (BAI) and Beck's Depression Inventory (BDI) scores were controlled. Using the visual backward masking paradigm, either a fearful or a neutral face stimulus was presented in varied durations (subthreshold, near-threshold, or suprathreshold) followed by a mask. Participants performed a two-alternative forced choice (2-AFC) emotion discrimination task on each face. Behavioral analysis showed that participants were unaware of masked stimuli of which duration was the shortest and, therefore, processed at subthreshold. Nevertheless, women showed significantly larger response in P100 amplitude to subthreshold fearful faces than men. This result remained consistent in the control experiment. Our findings indicate gender-differences in neural response to subthreshold emotional face, which is reflected in the early processing stage. PMID:28184189

Zernike Wavefront Sensor Modeling Development for LOWFS on WFIRST-AFTA

NASA Technical Reports Server (NTRS)

Wang, Xu; Wallace, J. Kent; Shi, Fang

2015-01-01

WFIRST-AFTA design makes use of an existing 2.4m telescope for direct imaging of exoplanets. To maintain the high contrast needed for the coronagraph, wavefront error (WFE) of the optical system needs to be continuously sensed and controlled. Low Order Wavefront Sensing (LOWFS) uses the rejected starlight from an immediate focal plane to sense wavefront changes (mostly thermally induced low order WFE) by combining the LOWFS mask (a phase plate located at the small center region with reflective layer) with the starlight rejection masks, i.e. Hybrid Lyot Coronagraph (HLC)'s occulter or Shaped Pupil Coronagraph (SPC)'s field stop. Zernike wavefront sensor (ZWFS) measures phase via the phase-contrast method and is known to be photon noise optimal for measuring low order aberrations. Recently, ZWFS was selected as the baseline LOWFS technology on WFIST/AFTA for its good sensitivity, accuracy, and its easy integration with the starlight rejection mask. In this paper, we review the theory of ZWFS operation, describe the ZWFS algorithm development, and summarize various numerical sensitivity studies on the sensor performance. In the end, the predicted sensor performance on SPC and HLC configurations are presented.

Creation of hybrid optoelectronic systems for document identification

NASA Astrophysics Data System (ADS)

Muravsky, Leonid I.; Voronyak, Taras I.; Kulynych, Yaroslav P.; Maksymenko, Olexander P.; Pogan, Ignat Y.

2001-06-01

Use of security devices based on a joint transform correlator (JTC) architecture for identification of credit cards and other products is very promising. The experimental demonstration of the random phase encoding technique for security verification shows that hybrid JTCs can be successfully utilized. The random phase encoding technique provides a very high protection level of products and things to be identified. However, the realization of this technique is connected with overcoming of the certain practical problems. To solve some of these problems and simultaneously to improve the security of documents and other products, we propose to use a transformed phase mask (TPM) as an input object in an optical correlator. This mask is synthesized from a random binary pattern (RBP), which is directly used to fabricate a reference phase mask (RPM). To obtain the TPM, we previously separate the RBP on a several parts (for example, K parts) of an arbitrary shape and further fabricate the TPM from this transformed RBP. The fabricated TPM can be bonded as the optical mark to any product or thing to be identified. If the RPM and the TPM are placed on the optical correlator input, the first diffracted order of the output correlation signal is containing the K narrow autocorrelation peaks. The distances between the peaks and the peak's intensities can be treated as the terms of the identification feature vector (FV) for the TPM identification.

Upward spread of informational masking in normal-hearing and hearing-impaired listeners

NASA Astrophysics Data System (ADS)

Alexander, Joshua M.; Lutfi, Robert A.

2003-04-01

Thresholds for pure-tone signals of 0.8, 2.0, and 5.0 kHz were measured in the presence of a simultaneous multitone masker in 15 normal-hearing and 8 hearing-impaired listeners. The masker consisted of fixed-frequency tones ranging from 522-8346 Hz at 1/3-octave intervals, excluding the 2/3-octave interval on either side of the signal. Masker uncertainty was manipulated by independently and randomly playing individual masker tones with probability p=0.5 or p=1.0 on each trial. Informational masking (IM) was estimated by the threshold difference (p=0.5 minus p=1.0). Decision weights were estimated from correlations of the listener's response with the occurrence of the signal and individual masker components on each trial. IM was greater for normal-hearing listeners than for hearing-impaired listeners, and most listeners had at least 10 dB of IM for one of the signal frequencies. For both groups, IM increased as the number of masker components below the signal frequency increased. Decision weights were also similar for both groups-masker frequencies below the signal were weighted more than those above. Implications are that normal-hearing and hearing-impaired individuals do not weight information differently in these masking conditions and that factors associated with listening may be partially responsible for the greater effectiveness of low-frequency maskers. [Work supported by NIDCD.

Improving 130nm node patterning using inverse lithography techniques for an analog process

NASA Astrophysics Data System (ADS)

Duan, Can; Jessen, Scott; Ziger, David; Watanabe, Mizuki; Prins, Steve; Ho, Chi-Chien; Shu, Jing

2018-03-01

Developing a new lithographic process routinely involves usage of lithographic toolsets and much engineering time to perform data analysis. Process transfers between fabs occur quite often. One of the key assumptions made is that lithographic settings are equivalent from one fab to another and that the transfer is fluid. In some cases, that is far from the truth. Differences in tools can change the proximity effect seen in low k1 imaging processes. If you use model based optical proximity correction (MBOPC), then a model built in one fab will not work under the same conditions at another fab. This results in many wafers being patterned to try and match a baseline response. Even if matching is achieved, there is no guarantee that optimal lithographic responses are met. In this paper, we discuss the approach used to transfer and develop new lithographic processes and define MBOPC builds for the new lithographic process in Fab B which was transferred from a similar lithographic process in Fab A. By using PROLITHTM simulations to match OPC models for each level, minimal downtime in wafer processing was observed. Source Mask Optimization (SMO) was also used to optimize lithographic processes using novel inverse lithography techniques (ILT) to simultaneously optimize mask bias, depth of focus (DOF), exposure latitude (EL) and mask error enhancement factor (MEEF) for critical designs for each level.

Bilateral Versus Unilateral Cochlear Implantation in Adult Listeners: Speech-On-Speech Masking and Multitalker Localization

PubMed Central

Buchholz, Jörg M.; Morgan, Catherine; Sharma, Mridula; Weller, Tobias; Konganda, Shivali Appaiah; Shirai, Kyoko; Kawano, Atsushi

2017-01-01

Binaural hearing helps normal-hearing listeners localize sound sources and understand speech in noise. However, it is not fully understood how far this is the case for bilateral cochlear implant (CI) users. To determine the potential benefits of bilateral over unilateral CIs, speech comprehension thresholds (SCTs) were measured in seven Japanese bilateral CI recipients using Helen test sentences (translated into Japanese) in a two-talker speech interferer presented from the front (co-located with the target speech), ipsilateral to the first-implanted ear (at +90° or −90°), and spatially symmetric at ±90°. Spatial release from masking was calculated as the difference between co-located and spatially separated SCTs. Localization was assessed in the horizontal plane by presenting either male or female speech or both simultaneously. All measurements were performed bilaterally and unilaterally (with the first implanted ear) inside a loudspeaker array. Both SCTs and spatial release from masking were improved with bilateral CIs, demonstrating mean bilateral benefits of 7.5 dB in spatially asymmetric and 3 dB in spatially symmetric speech mixture. Localization performance varied strongly between subjects but was clearly improved with bilateral over unilateral CIs with the mean localization error reduced by 27°. Surprisingly, adding a second talker had only a negligible effect on localization. PMID:28752811

Differential modulation of visual object processing in dorsal and ventral stream by stimulus visibility.

PubMed

Ludwig, Karin; Sterzer, Philipp; Kathmann, Norbert; Hesselmann, Guido

2016-10-01

As a functional organization principle in cortical visual information processing, the influential 'two visual systems' hypothesis proposes a division of labor between a dorsal "vision-for-action" and a ventral "vision-for-perception" stream. A core assumption of this model is that the two visual streams are differentially involved in visual awareness: ventral stream processing is closely linked to awareness while dorsal stream processing is not. In this functional magnetic resonance imaging (fMRI) study with human observers, we directly probed the stimulus-related information encoded in fMRI response patterns in both visual streams as a function of stimulus visibility. We parametrically modulated the visibility of face and tool stimuli by varying the contrasts of the masks in a continuous flash suppression (CFS) paradigm. We found that visibility - operationalized by objective and subjective measures - decreased proportionally with increasing log CFS mask contrast. Neuronally, this relationship was closely matched by ventral visual areas, showing a linear decrease of stimulus-related information with increasing mask contrast. Stimulus-related information in dorsal areas also showed a dependency on mask contrast, but the decrease rather followed a step function instead of a linear function. Together, our results suggest that both the ventral and the dorsal visual stream are linked to visual awareness, but neural activity in ventral areas more closely reflects graded differences in awareness compared to dorsal areas. Copyright © 2016 Elsevier Ltd. All rights reserved.

Photoresist composition for extreme ultraviolet lithography

DOEpatents

Felter, T. E.; Kubiak, G. D.

1999-01-01

A method of producing a patterned array of features, in particular, gate apertures, in the size range 0.4-0.05 .mu.m using projection lithography and extreme ultraviolet (EUV) radiation. A high energy laser beam is used to vaporize a target material in order to produce a plasma which in turn, produces extreme ultraviolet radiation of a characteristic wavelength of about 13 nm for lithographic applications. The radiation is transmitted by a series of reflective mirrors to a mask which bears the pattern to be printed. The demagnified focused mask pattern is, in turn, transmitted by means of appropriate optics and in a single exposure, to a substrate coated with photoresists designed to be transparent to EUV radiation and also satisfy conventional processing methods. A photoresist composition for extreme ultraviolet radiation of boron carbide polymers, hydrochlorocarbons and mixtures thereof.

Soft x-ray reduction camera for submicron lithography

DOEpatents

Hawryluk, A.M.; Seppala, L.G.

1991-03-26

Soft x-ray projection lithography can be performed using x-ray optical components and spherical imaging lenses (mirrors), which form an x-ray reduction camera. The x-ray reduction is capable of projecting a 5x demagnified image of a mask onto a resist coated wafer using 4.5 nm radiation. The diffraction limited resolution of this design is about 135 nm with a depth of field of about 2.8 microns and a field of view of 0.2 cm[sup 2]. X-ray reflecting masks (patterned x-ray multilayer mirrors) which are fabricated on thick substrates and can be made relatively distortion free are used, with a laser produced plasma for the source. Higher resolution and/or larger areas are possible by varying the optic figures of the components and source characteristics. 9 figures.

Interferometric at-wavelength flare characterization of EUV optical systems

DOEpatents

Naulleau, Patrick P.; Goldberg, Kenneth Alan

2001-01-01

The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) provides the high-accuracy wavefront characterization critical to the development of EUV lithography systems. Enhancing the implementation of the PS/PDI can significantly extend its spatial-frequency measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wavefront and flare. The enhanced technique employs a hybrid spatial/temporal-domain point diffraction interferometer (referred to as the dual-domain PS/PDI) that is capable of suppressing the scattered-reference-light noise that hinders the conventional PS/PDI. Using the dual-domain technique in combination with a flare-measurement-optimized mask and an iterative calculation process for removing flare contribution caused by higher order grating diffraction terms, the enhanced PS/PDI can be used to simultaneously measure both figure and flare in optical systems.

Experimental geometry for simultaneous beam characterization and sample imaging allowing for pink beam Fourier transform holography or coherent diffractive imaging

DOE Office of Scientific and Technical Information (OSTI.GOV)

Flewett, Samuel; Eisebitt, Stefan

2011-02-20

One consequence of the self-amplified stimulated emission process used to generate x rays in free electron lasers (FELs) is the intrinsic shot-to-shot variance in the wavelength and temporal coherence. In order to optimize the results from diffractive imaging experiments at FEL sources, it will be advantageous to acquire a means of collecting coherence and spectral information simultaneously with the diffraction pattern from the sample we wish to study. We present a holographic mask geometry, including a grating structure, which can be used to extract both temporal and spatial coherence information alongside the sample scatter from each individual FEL shot andmore » also allows for the real space reconstruction of the sample using either Fourier transform holography or iterative phase retrieval.« less

High numerical aperture ring field projection system for extreme ultraviolet lithography

DOEpatents

Hudyma, Russell

2001-01-01

An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first concave mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 12.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 15.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 7 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 14 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than 16.0 .mu.m.

Control over photo-inscription and thermal annealing to obtain high-quality Bragg gratings in doped PMMA optical fibers.

PubMed

Hu, Xuehao; Kinet, Damien; Mégret, Patrice; Caucheteur, Christophe

2016-07-01

Bragg gratings are photo-inscribed in trans-4-stilbenemethanol doped PMMA fibers using a 325 nm He-Cd laser and a phase mask. Two distinct behaviors are reported depending on the laser power density. In the high-density regime with 637  mW/mm², the grating reflectivity is stable over time after the writing process, but the reflected spectrum is of limited quality, as the grating length is limited to the laser width (1.2 mm). The beam is then enlarged to 6 mm, decreasing the power density to 127  mW/mm². In this case, the grating reflectivity strongly decays after the writing process. A fortunate property here results from the recovery of the initial reflectivity using a post-inscription thermal annealing. Both behaviors are attributed to the evolution between trans- and cis-isomers.

High numerical aperture ring field projection system for extreme ultraviolet lithography

DOEpatents

Hudyma, Russell; Shafer, David R.

2001-01-01

An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first convex mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receive a chief ray at an incidence angle of less than substantially 9.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 14.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than substantially 16 .mu.m.

High numerical aperture ring field projection system for extreme ultraviolet lithography

DOEpatents

Hudyma, Russell; Shafer, David

2001-01-01

An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first convex mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 9.degree., and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 14.degree.. Four of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 12 .mu.m. Each of the six reflecting surfaces has an aspheric departure of less than substantially 16 .mu.m.

Simultaneous measurements of radar reflectivity and refractive index spectra in clear air convection.

NASA Technical Reports Server (NTRS)

Konrad, T. G.; Robison, F. L.

1972-01-01

Simultaneous measurements of radar reflectivity and radio refractive index at several altitudes in clear air convection have been made. The experimental data were compared with the theoretical relationship which relates the reflectivity to the refractivity spectrum. The agreement between the measurements and the theory is excellent and shows that the radar returns in clear air are the result of, and can be quantitatively described as being from, fine-scale refractivity fluctuations due to turbulent mixing. Further, the data give strong support to the -5/3 spectral decay of the refractivity spectrum in the inertial subrange.

Evidence for differential modulation of primary and nonprimary auditory cortex by forward masking in tinnitus.

PubMed

Roberts, Larry E; Bosnyak, Daniel J; Bruce, Ian C; Gander, Phillip E; Paul, Brandon T

2015-09-01

It has been proposed that tinnitus is generated by aberrant neural activity that develops among neurons in tonotopic of regions of primary auditory cortex (A1) affected by hearing loss, which is also the frequency region where tinnitus percepts localize (Eggermont and Roberts 2004; Roberts et al., 2010, 2013). These models suggest (1) that differences between tinnitus and control groups of similar age and audiometric function should depend on whether A1 is probed in tinnitus frequency region (TFR) or below it, and (2) that brain responses evoked from A1 should track changes in the tinnitus percept when residual inhibition (RI) is induced by forward masking. We tested these predictions by measuring (128-channel EEG) the sound-evoked 40-Hz auditory steady-state response (ASSR) known to localize tonotopically to neural sources in A1. For comparison the N1 transient response localizing to distributed neural sources in nonprimary cortex (A2) was also studied. When tested under baseline conditions where tinnitus subjects would have heard their tinnitus, ASSR responses were larger in a tinnitus group than in controls when evoked by 500 Hz probes while the reverse was true for tinnitus and control groups tested with 5 kHz probes, confirming frequency-dependent group differences in this measure. On subsequent trials where RI was induced by masking (narrow band noise centered at 5 kHz), ASSR amplitude increased in the tinnitus group probed at 5 kHz but not in the tinnitus group probed at 500 Hz. When collapsed into a single sample tinnitus subjects reporting comparatively greater RI depth and duration showed comparatively larger ASSR increases after masking regardless of probe frequency. Effects of masking on ASSR amplitude in the control groups were completely reversed from those in the tinnitus groups, with no change seen to 5 kHz probes but ASSR increases to 500 Hz probes even though the masking sound contained no energy at 500 Hz (an "off-frequency" masking effect). In contrast to these findings for the ASSR, N1 amplitude was larger in tinnitus than control groups at both probe frequencies under baseline conditions, decreased after masking in all conditions, and did not relate to RI. These results suggest that aberrant neural activity occurring in the TFR of A1 underlies tinnitus and its modulation during RI. They indicate further that while neural changes occur in A2 in tinnitus, these changes do not reflect the tinnitus percept. Models for tinnitus and forward masking are described that integrate these findings within a common framework. Copyright © 2015 The Authors. Published by Elsevier B.V. All rights reserved.

Convenient mounting method for electrical measurements of thin samples

NASA Technical Reports Server (NTRS)

Matus, L. G.; Summers, R. L.

1986-01-01

A method for mounting thin samples for electrical measurements is described. The technique is based on a vacuum chuck concept in which the vacuum chuck simultaneously holds the sample and established electrical contact. The mounting plate is composed of a glass-ceramic insulating material and the surfaces of the plate and vacuum chuck are polished. The operation of the vacuum chuck is examined. The contacts on the sample and mounting plate, which are sputter-deposited through metal masks, are analyzed. The mounting method was utilized for van der Pauw measurements.

Multiple-Star System Adaptive Vortex Coronagraphy Using a Liquid Crystal Light Valve

NASA Astrophysics Data System (ADS)

Aleksanyan, Artur; Kravets, Nina; Brasselet, Etienne

2017-05-01

We propose the development of a high-contrast imaging technique enabling the simultaneous and selective nulling of several light sources. This is done by realizing a reconfigurable multiple-vortex phase mask made of a liquid crystal thin film on which local topological features can be addressed electro-optically. The method is illustrated by reporting on a triple-star optical vortex coronagraphy laboratory demonstration, which can be easily extended to higher multiplicity. These results allow considering the direct observation and analysis of worlds with multiple suns and more complex extrasolar planetary systems.

The Q Continuum: Encounter with the Cloud Mask

NASA Astrophysics Data System (ADS)

Ackerman, S. A.; Frey, R.; Holz, R.; Philips, C.; Dutcher, S.

2017-12-01

We are developing a common cloud mask for MODIS and VIIRS observations, referred to as the MODIS VIIRS Continuity Mask (MVCM). Our focus is on extending the MODIS-heritage cloud detection approach in order to generate appropriate climate data records for clouds and climate studies. The MVCM is based on heritage from the MODIS cloud mask (MOD35 and MYD35) and employs a series of tests on MODIS reflectances and brightness temperatures. Cloud detection is based on contrasts (i.e., cloud versus background surface) at pixel resolution. The MVCM follows the same approach. These cloud masks use multiple cloud detection tests to indicate the confidence level that the observation is of a clear-sky scene. The outcome of a test ranges from 0 (cloudy) to 1 (clear-sky scene). Because of overlap in the sensitivities of the various spectral tests to the type of cloud, each test is considered in one of several groups. The final cloud mask is determined from the product of the minimum confidence of each group and is referred to as the Q value as defined in Ackerman et al (1998). In MOD35 and MYD35 processing, the Q value is not output, rather predetermined Q values determine the result: If Q ≥ .99 the scene is clear; .95 ≤ Q < .99 the pixel is probably a clear scene, .66 ≤ Q < .95 is probably cloudy and Q < .66 is cloudy. Thus representing Q discretely and not as a continuum. For the MVCM, the numerical value of the Q is output along with the classification of clear, probably clear, probably cloudy, and cloudy. Through comparisons with collocated CALIOP and MODIS observations, we will assess the categorization of the Q values as a function of scene type ). While validation studies have indicated the utility and statistical correctness of the cloud mask approach, the algorithm does not possess immeasurable power and perfection. This comparison will assess the time and space dependence of Q and assure that the laws of physics are followed, at least according to normal human notions. Using CALIOP as representing truth, a receiver operating characteristic curve (ROC) will be analyzed to determine the optimum Q for various scenes and seasons, thus providing a continuum of discriminating thresholds.

Improved Phase-Mask Fabrication of Fiber Bragg Gratings

NASA Technical Reports Server (NTRS)

Grant, Joseph; Wang, Ying; Sharma, Anup

2004-01-01

An improved method of fabrication of Bragg gratings in optical fibers combines the best features of two prior methods: one that involves the use of a phase mask and one that involves interference between the two coherent laser beams. The improved method affords flexibility for tailoring Bragg wavelengths and bandwidths over wide ranges. A Bragg grating in an optical fiber is a periodic longitudinal variation in the index of refraction of the fiber core. The spatial period (Bragg wavelength) is chosen to obtain enhanced reflection of light of a given wavelength that would otherwise propagate relatively unimpeded along the core. Optionally, the spatial period of the index modulation can be made to vary gradually along the grating (such a grating is said to be chirped ) in order to obtain enhanced reflection across a wavelength band, the width of which is determined by the difference between the maximum and minimum Bragg wavelengths. In the present method as in both prior methods, a Bragg grating is formed by exposing an optical fiber to an ultraviolet-light interference field. The Bragg grating coincides with the pattern of exposure of the fiber core to ultraviolet light; in other words, the Bragg grating coincides with the interference fringes. Hence, the problem of tailoring the Bragg wavelength and bandwidth is largely one of tailoring the interference pattern and the placement of the fiber in the interference pattern. In the prior two-beam interferometric method, a single laser beam is split into two beams, which are subsequently recombined to produce an interference pattern at the location of an optical fiber. In the prior phase-mask method, a phase mask is used to diffract a laser beam mainly into two first orders, the interference between which creates the pattern to which an optical fiber is exposed. The prior two-beam interferometric method offers the advantage that the period of the interference pattern can be adjusted to produce gratings over a wide range of Bragg wavelengths, but offers the disadvantage that success depends on precise alignment and high mechanical stability. The prior phase-mask method affords the advantages of compactness of equipment and relative insensitivity to both misalignment and vibration, but does not afford adjustability of the Bragg wavelength. The present method affords both the flexibility of the prior two-beam interferometric method and the compactness and stability of the prior phase-mask method. In this method (see figure), a laser beam propagating along the x axis is normally incident on a phase mask that lies in the (y,z) plane. The phase of light propagating through the mask is modulated with a spatial periodicity, p, along the y axis chosen to diffract the laser light primarily to first order at the angle . (The zero-order laser light propagating along the x axis can be used for alignment and thereafter suppressed during exposure of the fiber.) The diffracted light passes through a concave cylindrical lens, which converts the flat diffracted wave fronts to cylindrical ones, as though the light emanated from a line source. Then two parallel flat mirrors recombine the diffracted beams to form an interference field equivalent to that of two coherent line sources at positions A and B (virtual sources). The interference pattern is a known function of the parameters of the apparatus and of position (x,y) in the interference field. Hence, the tilt, wavelength, and chirp of the Bragg grating can be chosen through suitable adjustments of the apparatus and/or of the position and orientation of the optical fiber. In particular, the Bragg wavelength can be adjusted by moving the fiber along the x axis, and the bandwidth can be modified over a wide range by changing the fiber tilt angle or by moving the phase mask and/or the fiber. Alignment is easy because the zero-order beam defines the x axis. The interference is relatively stable and insensitive to the mechanical vibration because of the gh symmetry and compactness of the apparatus, the fixed positions of the mirrors and lens, and the consequent fixed positions of the two virtual line sources, which are independent of the translations of the phase mask and the laser relative to the lens.

Using individual differences to test the role of temporal and place cues in coding frequency modulation

PubMed Central

Whiteford, Kelly L.; Oxenham, Andrew J.

2015-01-01

The question of how frequency is coded in the peripheral auditory system remains unresolved. Previous research has suggested that slow rates of frequency modulation (FM) of a low carrier frequency may be coded via phase-locked temporal information in the auditory nerve, whereas FM at higher rates and/or high carrier frequencies may be coded via a rate-place (tonotopic) code. This hypothesis was tested in a cohort of 100 young normal-hearing listeners by comparing individual sensitivity to slow-rate (1-Hz) and fast-rate (20-Hz) FM at a carrier frequency of 500 Hz with independent measures of phase-locking (using dynamic interaural time difference, ITD, discrimination), level coding (using amplitude modulation, AM, detection), and frequency selectivity (using forward-masking patterns). All FM and AM thresholds were highly correlated with each other. However, no evidence was obtained for stronger correlations between measures thought to reflect phase-locking (e.g., slow-rate FM and ITD sensitivity), or between measures thought to reflect tonotopic coding (fast-rate FM and forward-masking patterns). The results suggest that either psychoacoustic performance in young normal-hearing listeners is not limited by peripheral coding, or that similar peripheral mechanisms limit both high- and low-rate FM coding. PMID:26627783

Using individual differences to test the role of temporal and place cues in coding frequency modulation.

PubMed

Whiteford, Kelly L; Oxenham, Andrew J

2015-11-01

The question of how frequency is coded in the peripheral auditory system remains unresolved. Previous research has suggested that slow rates of frequency modulation (FM) of a low carrier frequency may be coded via phase-locked temporal information in the auditory nerve, whereas FM at higher rates and/or high carrier frequencies may be coded via a rate-place (tonotopic) code. This hypothesis was tested in a cohort of 100 young normal-hearing listeners by comparing individual sensitivity to slow-rate (1-Hz) and fast-rate (20-Hz) FM at a carrier frequency of 500 Hz with independent measures of phase-locking (using dynamic interaural time difference, ITD, discrimination), level coding (using amplitude modulation, AM, detection), and frequency selectivity (using forward-masking patterns). All FM and AM thresholds were highly correlated with each other. However, no evidence was obtained for stronger correlations between measures thought to reflect phase-locking (e.g., slow-rate FM and ITD sensitivity), or between measures thought to reflect tonotopic coding (fast-rate FM and forward-masking patterns). The results suggest that either psychoacoustic performance in young normal-hearing listeners is not limited by peripheral coding, or that similar peripheral mechanisms limit both high- and low-rate FM coding.

An experimental investigation of masking in the US FDA adverse event reporting system database.

PubMed

Wang, Hsin-wei; Hochberg, Alan M; Pearson, Ronald K; Hauben, Manfred

2010-12-01

A phenomenon of 'masking' or 'cloaking' in pharmacovigilance data mining has been described, which can potentially cause signals of disproportionate reporting (SDRs) to be missed, particularly in pharmaceutical company databases. Masking has been predicted theoretically, observed anecdotally or studied to a limited extent in both pharmaceutical company and health authority databases, but no previous publication systematically assesses its occurrence in a large health authority database. To explore the nature, extent and possible consequences of masking in the US FDA Adverse Event Reporting System (AERS) database by applying various experimental unmasking protocols to a set of drugs and events representing realistic pharmacovigilance analysis conditions. This study employed AERS data from 2001 through 2005. For a set of 63 Medical Dictionary for Regulatory Activities (MedDRA®) Preferred Terms (PTs), disproportionality analysis was carried out with respect to all drugs included in the AERS database, using a previously described urn-model-based algorithm. We specifically sought masking in which drug removal induced an increase in the statistical representation of a drug-event combination (DEC) that resulted in the emergence of a new SDR. We performed a series of unmasking experiments selecting drugs for removal using rational statistical decision rules based on the requirement of a reporting ratio (RR) >1, top-ranked statistical unexpectedness (SU) and relatedness as reflected in the WHO Anatomical Therapeutic Chemical level 4 (ATC4) grouping. In order to assess the possible extent of residual masking we performed two supplemental purely empirical analyses on a limited subset of data. This entailed testing every drug and drug group to determine which was most influential in uncovering masked SDRs. We assessed the strength of external evidence for a causal association for a small number of masked SDRs involving a subset of 29 drugs for which level of evidence adjudication was available from a previous study. The original disproportionality analysis identified 8719 SDRs for the 63 PTs. The SU-based unmasking protocols generated variable numbers of masked SDRs ranging from 38 to 156, representing a 0.43-1.8% increase over the number of baseline SDRs. A significant number of baseline SDRs were also lost in the course of our experiments. The trend in the number of gained SDRs per report removed was inversely related to the number of lost SDRs per protocol. Both the number and nature of the reports removed influenced the number of gained SDRs observed. The purely empirical protocols unmasked up to ten times as many SDRs. None of the masked SDRs had strong external evidence supporting a causal association. Most involved associations for which there was no external supporting evidence or were in the original product label. For two masked SDRs, there was external evidence of a possible causal association. We documented masking in the FDA AERS database. Attempts at unmasking SDRs using practically implementable protocols produced only small changes in the output of SDRs in our analysis. This is undoubtedly related to the large size and diversity of the database, but the complex interdependencies between drugs and events in authentic spontaneous reporting system (SRS) databases, and the impact of measures of statistical variability that are typically used in real-world disproportionality analysis, may be additional factors that constrain the discovery of masked SDRs and which may also operate in pharmaceutical company databases. Empirical determination of the most influential drugs may uncover significantly more SDRs than protocols based on predetermined statistical selection rules but are impractical except possibly for evaluating specific events. Routine global exercises to elicit masking, especially in large health authority databases are not justified based on results available to date. Exercises to elicit unmasking should be driven by prior knowledge or obvious data imbalances.

Simultaneous measurement of X-ray specular reflection and off-specular diffuse scattering from liquid surfaces using a two-dimensional pixel array detector: the liquid-interface reflectometer of BL37XU at SPring-8.

PubMed

Yano, Yohko F; Uruga, Tomoya; Tanida, Hajime; Toyokawa, Hidenori; Terada, Yasuko; Yamada, Hironari

2010-07-01

An X-ray reflectometer for simultaneous measurement of specular and off-specular reflection of liquid surfaces is described. The reflectometer, equipped with a two-dimensional single X-ray photon-counting pixel array detector obtained the full range of X-ray specular and off-specular reflections in an extremely short time (1 s). Both the specular and off-specular reflection of water exhibited good agreement with the predicted capillary-wave theory within the appropriate instrumental resolution. The approach is also demonstrated on an aqueous solution of 1-dodecyl-3-methylimidazolium chloride. The monolayer in which the dodecyl chain faces upwards and the Cl(-) anion locates next to the imidazolium ring formed on the water surface was found to be laterally homogeneous. The use of a pixel array detector will be particularly powerful for in situ measurements to investigate both out-of-plane and in-plane structures simultaneously, not only for liquid surfaces but also for other thin films.

Adapting MODIS Dust Mask Algorithm to Suomi NPP VIIRS for Air Quality Applications

NASA Astrophysics Data System (ADS)

Ciren, P.; Liu, H.; Kondragunta, S.; Laszlo, I.

2012-12-01

Despite pollution reduction control strategies enforced by the Environmental Protection Agency (EPA), large regions of the United States are often under exceptional events such as biomass burning and dust outbreaks that lead to non-attainment of particulate matter standards. This has warranted the National Weather Service (NWS) to provide smoke and dust forecast guidance to the general public. The monitoring and forecasting of dust outbreaks relies on satellite data. Currently, Aqua/MODIS (MODerate resolution Imaging Spectrometer) and Terra/MODIS provide measurements needed to derive dust mask and Aerosol Optical Thickness (AOT) products. The newly launched Suomi NPP VIIRS (Visible/Infrared Imaging Radiometer Suite) instrument has a Suspended Matter (SM) product that indicates the presence of dust, smoke, volcanic ash, sea salt, and unknown aerosol types in a given pixel. The algorithm to identify dust is different over land and ocean but for both, the information comes from AOT retrieval algorithm. Over land, the selection of dust aerosol model in the AOT retrieval algorithm indicates the presence of dust and over ocean a fine mode fraction smaller than 20% indicates dust. Preliminary comparisons of VIIRS SM to CALIPSO Vertical Feature Mask (VFM) aerosol type product indicate that the Probability of Detection (POD) is at ~10% and the product is not mature for operational use. As an alternate approach, NESDIS dust mask algorithm developed for NWS dust forecast verification that uses MODIS deep blue, visible, and mid-IR channels using spectral differencing techniques and spatial variability tests was applied to VIIRS radiances. This algorithm relies on the spectral contrast of dust absorption at 412 and 440 nm and an increase in reflectivity at 2.13 μm when dust is present in the atmosphere compared to a clear sky. To avoid detecting bright desert surface as airborne dust, the algorithm uses the reflectances at 1.24 μm and 2.25 μm to flag bright pixels. The algorithm flags pixels that fall into the glint region so sun glint is not picked up as dust. The algorithm also has a spatial variability test that uses reflectances at 0.86 μm to screen for clouds over water. Analysis of one granule for a known dust event on May 2, 2012 shows that the agreement between VIIRS and MODIS is 82% and VIIRS and CALIPSO is 71%. The probability of detection for VIIRS when compared to MODIS and CALIPSO is 53% and 45% respectively whereas the false alarm ratio for VIIRS when compared to MODIS and CALIPSO is 20% and 37% respectively. The algorithm details, results from the test cases, and the use of the dust flag product in NWS applications will be presented.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Naulleau, Patrick

With demonstrated resist resolution of 20 nm half pitch, the SEMATECH Berkeley BUV microfield exposure tool continues to push crucial advances in the areas of BUY resists and masks. The ever progressing shrink in computer chip feature sizes has been fueled over the years by a continual reduction in the wavelength of light used to pattern the chips. Recently, this trend has been threatened by unavailability of lens materials suitable for wavelengths shorter than 193 nm. To circumvent this roadblock, a reflective technology utilizing a significantly shorter extreme ultraviolet (EUV) wavelength (13.5 nm) has been under development for the pastmore » decade. The dramatic wavelength shrink was required to compensate for optical design limitations intrinsic in mirror-based systems compared to refractive lens systems. With this significant reduction in wavelength comes a variety of new challenges including developing sources of adequate power, photoresists with suitable resolution, sensitivity, and line-edge roughness characteristics, as well as the fabrication of reflection masks with zero defects. While source development can proceed in the absence of available exposure tools, in order for progress to be made in the areas of resists and masks it is crucial to have access to advanced exposure tools with resolutions equal to or better than that expected from initial production tools. These advanced development tools, however, need not be full field tools. Also, implementing such tools at synchrotron facilities allows them to be developed independent of the availability of reliable stand-alone BUY sources. One such tool is the SEMATECH Berkeley microfield exposure tool (MET). The most unique attribute of the SEMA TECH Berkeley MET is its use of a custom-coherence illuminator made possible by its implementation on a synchrotron beamline. With only conventional illumination and conventional binary masks, the resolution limit of the 0.3-NA optic is approximately 25 nm, however, with EUV not expected in production before the 22-nm half pitch node even finer resolution capabilities are now required from development tools. The SEMATECH Berkeley MET's custom-coherence illuminator allows it to be used with aggressive modified illumination enabling kJ factors as low as 0.25. Noting that the lithographic resolution of an exposure tool is defined as k{sub 1}{lambda}/NA, yielding an ultimate resolution limit of 11 nm. To achieve sub-20-nm aerial-image resolution while avoiding forbidden pitches on Manhattan-geometry features with the centrally-obscured MET optic, a 45-degree oriented dipole pupil fill is used. Figure 1 shows the computed aerial-image contrast as a function of half pitch for a dipole pupil fill optimized to print down to the 19-nm half pitch level. This is achieved with relatively uniform performance at larger dimensions. Using this illumination, printing down to the 20-nm half pitch level has been demonstrated in chemically amplified resists as shown in Fig. 2. The SEMATECH Berkeley MET tool plays a crucial role in the advancement of EUV resists. The unique programmable coherence properties of this tool enable it to achieve higher resolution than other EUV projection tools. As presented here, over the past year the tool has been used to demonstrate resist resolutions of 20 half pitch. Although not discussed here, because the Berkeley MET tool is a true projection lithography tool, it also plays a crucial role in advanced EUV mask research. Examples of the work done in this area include defect printability, mask architecture, and phase shift masks.« less

Automated cellular pathology in noninvasive confocal microscopy

NASA Astrophysics Data System (ADS)

Ting, Monica; Krueger, James; Gareau, Daniel

2014-03-01

A computer algorithm was developed to automatically identify and count melanocytes and keratinocytes in 3D reflectance confocal microscopy (RCM) images of the skin. Computerized pathology increases our understanding and enables prevention of superficial spreading melanoma (SSM). Machine learning involved looking at the images to measure the size of cells through a 2-D Fourier transform and developing an appropriate mask with the erf() function to model the cells. Implementation involved processing the images to identify cells whose image segments provided the least difference when subtracted from the mask. With further simplification of the algorithm, the program may be directly implemented on the RCM images to indicate the presence of keratinocytes in seconds and to quantify the keratinocytes size in the en face plane as a function of depth. Using this system, the algorithm can identify any irregularities in maturation and differentiation of keratinocytes, thereby signaling the possible presence of cancer.

Effects of stimulus font and size on masked repetition priming: An event-related potentials (ERP) investigation.

PubMed

Chauncey, Krysta; Holcomb, Phillip J; Grainger, Jonathan

2008-01-01

The size and font of target words were manipulated in a masked repetition priming paradigm with ERP recordings. Repetition priming effects were found in four ERP components: the N/P150, N250, P325, and N400. Neither a change in font nor a change in size across prime and target were found to affect repetition priming in the N250, P325, and N400 components. Changing font was, however, found to affect repetition priming in the N/P150 component, while the interaction between repetition priming and size was not significant in this component. These results confirm our interpretation of the N/P150 as a component sensitive to feature-level processing, and suggest that the type of prelexical and lexical processing reflected in the N250, P325, and N400 components is performed on representations that are invariant to changes in both font and size.

The time course of protecting a visual memory representation from perceptual interference

PubMed Central

van Moorselaar, Dirk; Gunseli, Eren; Theeuwes, Jan; N. L. Olivers, Christian

2015-01-01

Cueing a remembered item during the delay of a visual memory task leads to enhanced recall of the cued item compared to when an item is not cued. This cueing benefit has been proposed to reflect attention within visual memory being shifted from a distributed mode to a focused mode, thus protecting the cued item against perceptual interference. Here we investigated the dynamics of building up this mnemonic protection against visual interference by systematically varying the stimulus onset asynchrony (SOA) between cue onset and a subsequent visual mask in an orientation memory task. Experiment 1 showed that a cue counteracted the deteriorating effect of pattern masks. Experiment 2 demonstrated that building up this protection is a continuous process that is completed in approximately half a second after cue onset. The similarities between shifting attention in perceptual and remembered space are discussed. PMID:25628555

The association of color memory and the enumeration of multiple spatially overlapping sets.

PubMed

Poltoratski, Sonia; Xu, Yaoda

2013-07-09

Using dot displays, Halberda, Sires, and Feigenson (2006) showed that observers could simultaneously encode the numerosity of two spatially overlapping sets and the superset of all items at a glance. With the brief display and the masking used in Halberda et al., the task required observers to encode the colors of each set in order to select and enumerate all the dots in that set. As such, the observed capacity limit for set enumeration could reflect a limit in visual short-term memory (VSTM) capacity for the set color rather than a limit in set enumeration per se. Here, we largely replicated Halberda et al. and found successful enumeration of approximately two sets (the superset was not probed). We also found that only about two and a half colors could be remembered from the colored dot displays whether or not the enumeration task was performed concurrently with the color VSTM task. Because observers must remember the color of a set prior to enumerating it, the under three-item VSTM capacity for color necessarily dictates that set enumeration capacity in this paradigm could not exceed two sets. Thus, the ability to enumerate multiple spatially overlapping sets is likely limited by VSTM capacity to retain the discriminating feature of these sets. This relationship suggests that the capacity for set enumeration cannot be considered independently from the capacity for the set's defining features.

How attention influences perceptual decision making: Single-trial EEG correlates of drift-diffusion model parameters

PubMed Central

Nunez, Michael D.; Vandekerckhove, Joachim; Srinivasan, Ramesh

2016-01-01

Perceptual decision making can be accounted for by drift-diffusion models, a class of decision-making models that assume a stochastic accumulation of evidence on each trial. Fitting response time and accuracy to a drift-diffusion model produces evidence accumulation rate and non-decision time parameter estimates that reflect cognitive processes. Our goal is to elucidate the effect of attention on visual decision making. In this study, we show that measures of attention obtained from simultaneous EEG recordings can explain per-trial evidence accumulation rates and perceptual preprocessing times during a visual decision making task. Models assuming linear relationships between diffusion model parameters and EEG measures as external inputs were fit in a single step in a hierarchical Bayesian framework. The EEG measures were features of the evoked potential (EP) to the onset of a masking noise and the onset of a task-relevant signal stimulus. Single-trial evoked EEG responses, P200s to the onsets of visual noise and N200s to the onsets of visual signal, explain single-trial evidence accumulation and preprocessing times. Within-trial evidence accumulation variance was not found to be influenced by attention to the signal or noise. Single-trial measures of attention lead to better out-of-sample predictions of accuracy and correct reaction time distributions for individual subjects. PMID:28435173

How attention influences perceptual decision making: Single-trial EEG correlates of drift-diffusion model parameters.

PubMed

Nunez, Michael D; Vandekerckhove, Joachim; Srinivasan, Ramesh

2017-02-01

Perceptual decision making can be accounted for by drift-diffusion models, a class of decision-making models that assume a stochastic accumulation of evidence on each trial. Fitting response time and accuracy to a drift-diffusion model produces evidence accumulation rate and non-decision time parameter estimates that reflect cognitive processes. Our goal is to elucidate the effect of attention on visual decision making. In this study, we show that measures of attention obtained from simultaneous EEG recordings can explain per-trial evidence accumulation rates and perceptual preprocessing times during a visual decision making task. Models assuming linear relationships between diffusion model parameters and EEG measures as external inputs were fit in a single step in a hierarchical Bayesian framework. The EEG measures were features of the evoked potential (EP) to the onset of a masking noise and the onset of a task-relevant signal stimulus. Single-trial evoked EEG responses, P200s to the onsets of visual noise and N200s to the onsets of visual signal, explain single-trial evidence accumulation and preprocessing times. Within-trial evidence accumulation variance was not found to be influenced by attention to the signal or noise. Single-trial measures of attention lead to better out-of-sample predictions of accuracy and correct reaction time distributions for individual subjects.

Exploring the source of the mid-level hump for intensity discrimination in quiet and the effects of noisea)

PubMed Central

Roverud, Elin; Strickland, Elizabeth A.

2015-01-01

Intensity discrimination Weber fractions (WFs) measured for short, high-frequency tones in quiet are larger at mid levels than at lower or higher levels. The source of this “mid-level hump” is a matter of debate. One theory is that the mid-level hump reflects basilar-membrane compression, and that WFs decrease at higher levels due to spread-of-excitation cues. To test this theory, Experiment 1 measured the mid-level hump and growth-of-masking functions to estimate the basilar membrane input/output (I/O) function in the same listeners. Results showed the initial rise in WFs could be accounted for by the change in I/O function slope, but there was additional unexplained variability in WFs. Previously, Plack [(1998). J. Acoust. Soc. Am. 103(5), 2530–2538] showed that long-duration notched noise (NN) presented with the tone reduced the mid-level hump even with a temporal gap in the NN. Plack concluded the results were consistent with central profile analysis. However, simultaneous, forward, and backward NN were not examined separately, which may independently test peripheral and central mechanisms of the NN. Experiment 2 measured WFs at the mid-level hump in the presence of NN and narrowband noise of different durations and temporal positions relative to the tone. Results varied across subjects, but were consistent with more peripheral mechanisms. PMID:25786945

A new CT collimator for producing two simultaneous overlapping slices from one scan. [for biomedical applications

NASA Technical Reports Server (NTRS)

Kwoh, Y. S.; Glenn, W. V., Jr.; Reed, I. S.; Truong, T. K.

1981-01-01

A new CT collimator is developed which is capable of producing two simultaneous successive overlapping images from a single scan. The collimator represents a modification of the standard EMI 5005 collimator achieved by alternately masking one end or portions of both ends of the X-ray detectors at a 13-mm beamwidth so that a set of 540 filtered projections is obtained for each scan which can be separated into two sets of interleaved projections corresponding to views 3 mm apart. Tests have demonstrated that the quality of the images produced from these two projections almost equals the quality of those produced by the standard collimator from two separate scans. The new collimator may thus be used to achieve a speed improvement in the generation of overlapping sections as well as a reduction in X-ray dosage.

Discrimination of face gender and expression under dual-task conditions.

PubMed

García-Gutiérrez, Ana; Aguado, Luis; Romero-Ferreiro, Verónica; Pérez-Moreno, Elisa

2017-02-01

In order to test whether expression and gender can be attended to simultaneously without a cost in accuracy four experiments were carried out using a dual gender-expression task with male and female faces showing different emotional expressions that were backward masked by emotionally neutral faces. In the dual-facial condition the participants had to report both the gender and the expression of the targets. In two control conditions the participant reported either the gender or the expression of the face and indicated whether a surrounding frame was continuous or discontinuous. In Experiments 1-3, with angry and happy targets, asymmetric interference was observed. Gender discrimination, but no expression discrimination, was impaired in the dual-facial condition compared to the corresponding control. This effect was obtained with a between-subjects design in Experiment 1, with a within-subjects design in Experiment 2, and with androgynous face masks in Experiment 3. In Experiments 4a and 4b different target combinations were tested. No decrement of performance in the dual-facial task was observed for either gender or expression discrimination with fearful-disgusted (Experiment 4a) or fearful-happy faces (Experiment 4b). We conclude that the ability to attend simultaneously to gender and expression cues without a decrement in performance depends on the specific combination of expressions to be differentiated between. Happy and angry expressions are usually directed at the perceiver and command preferential attention. Under conditions of restricted viewing such as those of the present study, discrimination of these expressions is prioritized leading to impaired discrimination of other facial properties such as gender.

Facemasks for the prevention of infection in healthcare and community settings.

PubMed

MacIntyre, C Raina; Chughtai, Abrar Ahmad

2015-04-09

Facemasks are recommended for diseases transmitted through droplets and respirators for respiratory aerosols, yet recommendations and terminology vary between guidelines. The concepts of droplet and airborne transmission that are entrenched in clinical practice have recently been shown to be more complex than previously thought. Several randomised clinical trials of facemasks have been conducted in community and healthcare settings, using widely varying interventions, including mixed interventions (such as masks and handwashing), and diverse outcomes. Of the nine trials of facemasks identified in community settings, in all but one, facemasks were used for respiratory protection of well people. They found that facemasks and facemasks plus hand hygiene may prevent infection in community settings, subject to early use and compliance. Two trials in healthcare workers favoured respirators for clinical respiratory illness. The use of reusable cloth masks is widespread globally, particularly in Asia, which is an important region for emerging infections, but there is no clinical research to inform their use and most policies offer no guidance on them. Health economic analyses of facemasks are scarce and the few published cost effectiveness models do not use clinical efficacy data. The lack of research on facemasks and respirators is reflected in varied and sometimes conflicting policies and guidelines. Further research should focus on examining the efficacy of facemasks against specific infectious threats such as influenza and tuberculosis, assessing the efficacy of cloth masks, investigating common practices such as reuse of masks, assessing compliance, filling in policy gaps, and obtaining cost effectiveness data using clinical efficacy estimates. © BMJ Publishing Group Ltd 2015.

Regional brain activity during early visual perception in unaffected siblings of schizophrenia patients.

PubMed

Lee, Junghee; Cohen, Mark S; Engel, Stephen A; Glahn, David; Nuechterlein, Keith H; Wynn, Jonathan K; Green, Michael F

2010-07-01

Visual masking paradigms assess the early part of visual information processing, which may reflect vulnerability measures for schizophrenia. We examined the neural substrates of visual backward performance in unaffected sibling of schizophrenia patients using functional magnetic resonance imaging (fMRI). Twenty-one unaffected siblings of schizophrenia patients and 19 healthy controls performed a backward masking task and three functional localizer tasks to identify three visual processing regions of interest (ROI): lateral occipital complex (LO), the motion-sensitive area, and retinotopic areas. In the masking task, we systematically manipulated stimulus onset asynchronies (SOAs). We analyzed fMRI data in two complementary ways: 1) an ROI approach for three visual areas, and 2) a whole-brain analysis. The groups did not differ in behavioral performance. For ROI analysis, both groups increased activation as SOAs increased in LO. Groups did not differ in activation levels of the three ROIs. For whole-brain analysis, controls increased activation as a function of SOAs, compared with siblings in several regions (i.e., anterior cingulate cortex, posterior cingulate cortex, inferior prefrontal cortex, inferior parietal lobule). The study found: 1) area LO showed sensitivity to the masking effect in both groups; 2) siblings did not differ from controls in activation of LO; and 3) groups differed significantly in several brain regions outside visual processing areas that have been related to attentional or re-entrant processes. These findings suggest that LO dysfunction may be a disease indicator rather than a risk indicator for schizophrenia. Copyright 2010 Society of Biological Psychiatry. Published by Elsevier Inc. All rights reserved.

Chirped fiber Bragg grating written in highly birefringent fiber in simultaneous strain and temperature monitoring.

PubMed

Bieda, Marcin S; Sobotka, Piotr; Woliński, Tomasz R

2017-02-20

A new sensor configuration is proposed for simultaneous strain and temperature monitoring in a composite material that is based on a chirped fiber Bragg grating (CFBG) written in a highly birefringent (HB) polarization-maintaining fiber. The sensor is designed in the reflective configuration in which the CFBG acts both as a reflector and a sensing element. Since CFBG and HB fiber induce changes in the state of polarization (SOP), interference between polarization modes in the reflected spectrum is observed and analyzed. We used a simple readout setup to enable fast, linear operation of strain sensing as well simultaneous strain and temperature measurements in the composite.

Online Multitasking Line-Scan Imaging Techniques for Simultaneous Safety and Quality Evaluation of Apples

NASA Astrophysics Data System (ADS)

Kim, Moon Sung; Lee, Kangjin; Chao, Kaunglin; Lefcourt, Alan; Cho, Byung-Kwan; Jun, Won

We developed a push-broom, line-scan imaging system capable of simultaneous measurements of reflectance and fluorescence. The system allows multitasking inspections for quality and safety attributes of apples due to its dynamic capabilities in simultaneously capturing fluorescence and reflectance, and selectivity in multispectral bands. A multitasking image-based inspection system for online applications has been suggested in that a single imaging device that could perform a multitude of both safety and quality inspection needs. The presented multitask inspection approach in online applications may provide an economically viable means for a number of food processing industries being able to adapt to operate and meet the dynamic and specific inspection and sorting needs.

Simultaneous parameter optimization of x-ray and neutron reflectivity data using genetic algorithms

DOE Office of Scientific and Technical Information (OSTI.GOV)

Singh, Surendra, E-mail: surendra@barc.gov.in; Basu, Saibal

2016-05-23

X-ray and neutron reflectivity are two non destructive techniques which provide a wealth of information on thickness, structure and interracial properties in nanometer length scale. Combination of X-ray and neutron reflectivity is well suited for obtaining physical parameters of nanostructured thin films and superlattices. Neutrons provide a different contrast between the elements than X-rays and are also sensitive to the magnetization depth profile in thin films and superlattices. The real space information is extracted by fitting a model for the structure of the thin film sample in reflectometry experiments. We have applied a Genetic Algorithms technique to extract depth dependentmore » structure and magnetic in thin film and multilayer systems by simultaneously fitting X-ray and neutron reflectivity data.« less

The LaueUtil toolkit for Laue photocrystallography. II. Spot finding and integration

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kalinowski, Jaroslaw A.; Fournier, Bertrand; Makal, Anna

2015-10-15

A spot-integration method is described which does not require prior indexing of the reflections. It is based on statistical analysis of the values from each of the pixels on successive frames, followed for each frame by morphological analysis to identify clusters of high value pixels which form an appropriate mask corresponding to a reflection peak. The method does not require prior assumptions such as fitting of a profile or definition of an integration box. The results are compared with those of the seed-skewness method which is based on minimizing the skewness of the intensity distribution within a peak's integration box.more » Applications in Laue photocrystallography are presented.« less

The monaural temporal window based on masking period pattern data in school-aged children and adults.

PubMed

Buss, Emily; He, Shuman; Grose, John H; Hall, Joseph W

2013-03-01

Several lines of evidence indicate that auditory temporal resolution improves over childhood, whereas other data implicate the development of processing efficiency. The present study used the masking period pattern paradigm to examine the maturation of temporal processing in normal-hearing children (4.8 to 10.7 yrs) compared to adults. Thresholds for a brief tone were measured at 6 temporal positions relative to the period of a 5-Hz quasi-square-wave masker envelope, with a 20-dB modulation depth, as well as in 2 steady maskers. The signal was a pure tone at either 1000 or 6500 Hz, and the masker was a band of noise, either spectrally wide or narrow (21.3 and 1.4 equivalent rectangular bandwidths, respectively). Masker modulation improved thresholds more for wide than narrow bandwidths, and adults tended to receive more benefit from modulation than young children. Fits to data for the wide maskers indicated a change in window symmetry with development, reflecting relatively greater backward masking for the youngest listeners. Data for children >6.5 yrs of age appeared more adult-like for the 6500- than the 1000-Hz signal. Differences in temporal window asymmetry with listener age cannot be entirely explained as a consequence of a higher criterion for detection in children, a form of inefficiency.

Preparing nano-hole arrays by using porous anodic aluminum oxide nano-structural masks for the enhanced emission from InGaN/GaN blue light-emitting diodes

NASA Astrophysics Data System (ADS)

Nguyen, Hoang-Duy; Nguyen, Hieu Pham Trung; Lee, Jae-jin; Mho, Sun-Il

2012-12-01

We report on the achievement of the enhanced cathodoluminescence (CL) from InGaN/GaN light-emitting diodes (LEDs) by using roughening surface. Nanoporous anodic aluminum oxide (AAO) mask was utilized to form nano-hole arrays on the surface of InGaN/GaN LEDs. AAO membranes with ordered hexagonal structures were fabricated from aluminum foils by a two-step anodization method. The average pore densities of ˜1.0 × 1010 cm-2 and 3.0 × 1010 cm-2 were fabricated with the constant anodization voltages of 25 and 40 V, respectively. Anodic porous alumina film with a thickness of ˜600 nm has been used as a mask for the induced couple plasma etching process to fabricate nano-hole arrays on the LED surface. Diameter and depth of nano-holes can be controlled by varying the etching duration and/or the diameter of AAO membranes. Due to the reduction of total internal reflection obtained in the patterned samples, we have observed that the cathodoluminescence intensity of LEDs with nanoporous structures is increased up to eight times compared to that of samples without using nanoporous structure.

Combinatorial synthesis and hydrogenation of Mg/Al libraries prepared by electron beam physical vapor deposition.

PubMed

Garcia, Gemma; Doménech-Ferrer, Roger; Pi, Francesc; Santiso, Josep; Rodríguez-Viejo, Javier

2007-01-01

We have grown thin film libraries of the Mg-Al system using a high-throughput synthesis methodology that combines the sequential deposition of pure elements (Mg and Al) by an electron-beam (e-beam) evaporation technique and the use of a special set of moving shadow masks. This novel mask has been designed to simultaneously prepare four identical arrays of different compositions that will permit the characterization of the same library after several treatments. Wavelength dispersive spectroscopy (WDS) and micro-X-ray diffraction have been used as high-throughput screening techniques for the determination of the composition and structure of every member of the library in the as-deposited state and after hydrogenation at 1 atm of H2 during 24 h at three different temperatures: 60, 80, and 110 degrees C. We have analyzed the influence of the Mg-Al ratio on the hydrogenation of magnesium, as well as on the appearance of complex hydride phases. We have also found that aluminum can act as a catalyzer for the hydrogenation reaction of magnesium.

FPGA Control System for the Automated Test of Microshutters

NASA Technical Reports Server (NTRS)

Lyness, Eric; Rapchun, David A.; Moseley, S. Harvey

2008-01-01

The James Webb Space Telescope, scheduled to replace the Hubble in 2013, must simultaneously observe hundreds of faint galaxies. This requirement has led to the development of a programmable transmission mask which can be adapted to admit light with arbitrary pattern of galaxies into its spectrograph. This programmable mask will contain a large array of micro-electromechanical (MEMs) devices called MicroShutters. These microscopic shutters physically open and close like the shutter on a camera, except each shutter is microscopic in size and an array 365 by 171 is used to select the objects under spectroscopic observation at a given time, and to block the unwanted background light from other areas. NASA developed and is currently refining the exceptionally difficult process of manufacturing these shutters. This paper describes how the authors used LabVIEW FPGA and a reconfigurable I/O board to control the shutters in a test chamber and how the flexibility of the system allows us to continue to modify the control algorithms as NASA optimizes the performance of the MicroShutter arrays.

FPGA Control System for the Automated Test of MicroShutters

NASA Technical Reports Server (NTRS)

Lyness, Eric; Rapchun, David A.; Moseley, S. Harvey

2008-01-01

The James Webb Space Telescope, scheduled to replace the Hubble in 2013, must simultaneously observe hundreds of faint galaxies. This requirement has led to the development of a programmable transmission mask which can be adapted to admit light from an arbitrary pattern of galaxies into its spectrograph. This programmable mask will contain a large array of micro-electromechanical (MEMs) devices called MicroShutters. These microscopic shutters physically open and close like the shutter on a camera, except each shutter is microscopic in size and an array 365 by 171 is used to select the objects under spectroscopic observation at a given time, and to block the unwanted background light from other areas. NASA developed and is currently refining the exceptionally difficult process of manufacturing these shutters. This paper describes how the authors used LabVIEW FPGA and a reconfigurable I/O board to control the shutters in a test chamber and how the flexibility of the system allows us to continue to modify the control algorithms as NASA optimizes the performance of the MicroShutter arrays.

Systems and methods for the combinatorial synthesis of novel materials

DOEpatents

Wu, Xin Di; Wang, Youqi; Goldwasser, Isy

2000-01-01

Methods and apparatus for the preparation of a substrate having an array of diverse materials in predefined regions thereon. A substrate having an array of diverse materials thereon is generally prepared by depositing components of target materials to predefined regions on the substrate, and, in some embodiments, simultaneously reacting the components to form at least two resulting materials. In particular, the present invention provides novel masking systems and methods for applying components of target materials onto a substrate in a combinatorial fashion, thus creating arrays of resulting materials that differ slightly in composition, stoichiometry, and/or thickness. Using the novel masking systems of the present invention, components can be delivered to each site in a uniform distribution, or in a gradient of stoichiometries, thicknesses, compositions, etc. Resulting materials which can be prepared using the methods and apparatus of the present invention include, for example, covalent network solids, ionic solids and molecular solids. Once prepared, these resulting materials can be screened sequentially, or in parallel, for useful properties including, for example, electrical, thermal, mechanical, morphological, optical, magnetic, chemical and other properties.

High Contrast Programmable Field Masks for JWST NIRSpec

NASA Technical Reports Server (NTRS)

Kutyrev, Alexander S.

2008-01-01

Microshutter arrays are one of the novel technologies developed for the James Webb Space Telescope (JWST). It will allow Near Infrared Spectrometer (NIRSpec) to acquire spectra of hundreds of objects simultaneously therefore increasing its efficiency tremendously. We have developed these programmable arrays that are based on Micro-Electro Mechanical Structures (MEMS) technology. The arrays are 2D addressable masks that can operate in cryogenic environment of JWST. Since the primary JWST science requires acquisition of spectra of extremely faint objects, it is important to provide very high contrast of the open to closed shutters. This high contrast is necessary to eliminate any possible contamination and confusion in the acquired spectra by unwanted objects. We have developed and built a test system for the microshutter array functional and optical characterization. This system is capable of measuring the contrast of the microshutter array both in visible and infrared light of the NIRSpec wavelength range while the arrays are in their working cryogenic environment. We have measured contrast ratio of several microshutter arrays and demonstrated that they satisfy and in many cases far exceed the NIRSpec contrast requirement value of 2000.

Manufacturing the Horns of Dilemma: A Theory of Operational Initiative

DTIC Science & Technology

2015-05-21

Army began to understand CCF tactics by December, 1950. The Chinese preferred to infiltrate their infantry during darkness , utilized terrain to mask...most concerned with retaining its freedom of action against the CCF. The Third Chinese Counteroffensive began just after dark on December 31, 1950 and...IDF entered a process of soul -searching and reflection that questioned deeply held assumptions about the capabilities and utility of the IDF in the

Estimation of crystallinity in a model thermoplastic composite

NASA Technical Reports Server (NTRS)

Wakelyn, N. T.

1986-01-01

Crystallinities as low as 16 percent have been estimated by determination of the interplanar spacing on PET/carbonaceous filament composites with resin content of aobut 25 percent w/w using wide-angle X-ray scattering (WAXS) in the angular range 2 theta = 16-18 deg. The diffraction pattern of the carbonaceous reinforcements masks the major reflections of the resin, and the resin content and the crystallinity are kept low to make the simulation reasonable.

The Department of Defense: Reducing Its Reliance on Fossil-Based Aviation Fuel - Issues for Congress

DTIC Science & Technology

2007-06-15

19 Figure 2. KC-135 Winglet Flight Tests at Dryden Flight Research Center . . . . 23 List of Tables Table 1...involving two or more opposing forces using rules, data, and procedures designed to depict an actual or assumed real life situation.” 19 Winglets , for...applying winglets to DOD aircraft. See page 24 of this report for further information. reflect the DOD’s true fuel costs, masks energy efficiency

Optical monitor for real time thickness change measurements via lateral-translation induced phase-stepping interferometry

DOEpatents

Rushford, Michael C.

2002-01-01

An optical monitoring instrument monitors etch depth and etch rate for controlling a wet-etching process. The instrument provides means for viewing through the back side of a thick optic onto a nearly index-matched interface. Optical baffling and the application of a photoresist mask minimize spurious reflections to allow for monitoring with extremely weak signals. A Wollaston prism enables linear translation for phase stepping.

Suppression of vegetation in LANDSAT ETM+ remote sensing images

NASA Astrophysics Data System (ADS)

Yu, Le; Porwal, Alok; Holden, Eun-Jung; Dentith, Michael

2010-05-01

Vegetation cover is an impediment to the interpretation of multispectral remote sensing images for geological applications, especially in densely vegetated terrains. In order to enhance the underlying geological information in such terrains, it is desirable to suppress the reflectance component of vegetation. One form of spectral unmixing that has been successfully used for vegetation reflectance suppression in multispectral images is called "forced invariance". It is based on segregating components of the reflectance spectrum that are invariant with respect to a specific spectral index such as the NDVI. The forced invariance method uses algorithms such as software defoliation. However, the outputs of software defoliation are single channel data, which are not amenable to geological interpretations. Crippen and Blom (2001) proposed a new forced invariance algorithm that utilizes band statistics, rather than band ratios. The authors demonstrated the effectiveness of their algorithms on a LANDSAT TM scene from Nevada, USA, especially in open canopy areas in mixed and semi-arid terrains. In this presentation, we report the results of our experimentation with this algorithm on a densely to sparsely vegetated Landsat ETM+ scene. We selected a scene (Path 119, Row 39) acquired on 18th July, 2004. Two study areas located around the city of Hangzhou, eastern China were tested. One of them covers uninhabited hilly terrain characterized by low rugged topography, parts of the hills are densely vegetated; another one covers both inhabited urban areas and uninhabited hilly terrain, which is densely vegetated. Crippen and Blom's algorithm is implemented in the following sequential steps: (1) dark pixel correction; (2) vegetation index calculation; (3) estimation of statistical relationship between vegetation index and digital number (DN) values for each band; (4) calculation of a smooth best-fit curve for the above relationships; and finally, (5) selection of a target average DN value and scaling all pixels at each vegetation index level by an amount that shifts the curve to the target digital number (DN). The main drawback of their algorithm is severe distortions of the DN values of non-vegetated areas, a suggested solution is masking outliers such as cloud, water, etc. We therefore extend this algorithm by masking non-vegetated areas. Our algorithm comprises the following three steps: (1) masking of barren or sparsely vegetated areas using a threshold based on a vegetation index that is calculated after atmosphere correction (dark pixel correction and ACTOR were compared) in order to conserve their original spectral information through the subsequent processing; (2) applying Crippen and Blom's forced invariance algorithm to suppress the spectral response of vegetation only in vegetated areas; and (3) combining the processed vegetated areas with the masked barren or sparsely vegetated areas followed by histogram equalization to eliminate the differences in color-scales between these two types of areas, and enhance the integrated image. The output images of both study areas showed significant improvement over the original images in terms of suppression of vegetation reflectance and enhancement of the underlying geological information. The processed images show clear banding, probably associated with lithological variations in the underlying rock formations. The colors of non-vegetated pixels are distorted in the unmasked results but in the same location the pixels in the masked results show regions of higher contrast. We conclude that the algorithm offers an effective way to enhance geological information in LANDSAT TM/ETM+ images of terrains with significant vegetation cover. It is also suitable to other multispectral satellite data have bands in similar wavelength regions. In addition, an application of this method to hyperspectral data may be possible as long as it can provide the vegetation band ratios.

Structure for monolithic optical circuits

NASA Technical Reports Server (NTRS)

Evanchuk, Vincent L. (Inventor)

1984-01-01

A method for making monolithic optical circuits, with related optical devices as required or desired, on a supporting surface (10) consists of coating the supporting surface with reflecting metal or cladding resin, spreading a layer of liquid radiation sensitive plastic (12) on the surface, exposing the liquid plastic with a mask (14) to cure it in a desired pattern of light conductors (16, 18, 20), washing away the unexposed liquid plastic, and coating the conductors thus formed with reflective metal or cladding resin. The index of refraction for the cladding (22) is selected to be lower than for the conductors so that light in the conductors will be reflected by the interface with the cladding. For multiple level conductors, as where one conductor must cross over another, the process may be repeated to fabricate a bridge with columns (24, 26) of conductors to the next level, and conductor (28) between the columns. For more efficient transfer of energy over the bridge, faces at 45.degree. may be formed to reflect light up and across the bridge.

x-y curvature wavefront sensor.

PubMed

Cagigal, Manuel P; Valle, Pedro J

2015-04-15

In this Letter, we propose a new curvature wavefront sensor based on the principles of optical differentiation. The theoretically modeled setup consists of a diffractive optical mask placed at the intermediate plane of a classical two-lens coherent optical processor. The resulting image is composed of a number of local derivatives of the entrance pupil function whose proper combination provides the wavefront curvature. In contrast to the common radial curvature sensors, this one is able to provide the x and y wavefront curvature maps simultaneously. The sensor offers other additional advantages like having high spatial resolution, adjustable dynamic range, and not being sensitive to misalignment.

Decarbonylation and dehydrogenation of carbohydrates

DOEpatents

Andrews, Mark A.; Klaeren, Stephen A.

1991-01-01

Carbohydrates, especially aldose or ketose sugars, including those whose carbonyl group is masked by hemi-acetal or hemi-ketal formation, are decarbonylated by heating the feed carbohydrate together with a transition metal complex in a suitable solvent. Also, primary alcohols, including sugar alditols are simultaneously dehydrogenated and decarbonylated by heating a mixture of rhodium and ruthenium complexes and the alcohol and optionally a hydrogen acceptor in an acceptable solvent. Such defarbonylation and/or dehydrogenation of sugars provides a convenient procedure for the synthesis of certain carbohydrates and may provide a means for the conversion of biomass into useful products.

Enhancing the image resolution in a single-pixel sub-THz imaging system based on compressed sensing

NASA Astrophysics Data System (ADS)

Alkus, Umit; Ermeydan, Esra Sengun; Sahin, Asaf Behzat; Cankaya, Ilyas; Altan, Hakan

2018-04-01

Compressed sensing (CS) techniques allow for faster imaging when combined with scan architectures, which typically suffer from speed. This technique when implemented with a subterahertz (sub-THz) single detector scan imaging system provides images whose resolution is only limited by the pixel size of the pattern used to scan the image plane. To overcome this limitation, the image of the target can be oversampled; however, this results in slower imaging rates especially if this is done in two-dimensional across the image plane. We show that by implementing a one-dimensional (1-D) scan of the image plane, a modified approach to CS theory applied with an appropriate reconstruction algorithm allows for successful reconstruction of the reflected oversampled image of a target placed in standoff configuration from the source. The experiments are done in reflection mode configuration where the operating frequency is 93 GHz and the corresponding wavelength is λ = 3.2 mm. To reconstruct the image with fewer samples, CS theory is applied using masks where the pixel size is 5 mm × 5 mm, and each mask covers an image area of 5 cm × 5 cm, meaning that the basic image is resolved as 10 × 10 pixels. To enhance the resolution, the information between two consecutive pixels is used, and oversampling along 1-D coupled with a modification of the masks in CS theory allowed for oversampled images to be reconstructed rapidly in 20 × 20 and 40 × 40 pixel formats. These are then compared using two different reconstruction algorithms, TVAL3 and ℓ1-MAGIC. The performance of these methods is compared for both simulated signals and real signals. It is found that the modified CS theory approach coupled with the TVAL3 reconstruction process, even when scanning along only 1-D, allows for rapid precise reconstruction of the oversampled target.

Atmospheric Correction at AERONET Locations: A New Science and Validation Data Set

NASA Technical Reports Server (NTRS)

Wang, Yujie; Lyapustin, Alexei; Privette, Jeffery L.; Morisette, Jeffery T.; Holben, Brent

2008-01-01

This paper describes an AERONET-based Surface Reflectance Validation Network (ASRVN) and its dataset of spectral surface bidirectional reflectance and albedo based on MODIS TERRA and AQUA data. The ASRVN is an operational data collection and processing system. It receives 50x50 square kilometer subsets of MODIS L1B data from MODAPS and AERONET aerosol and water vapor information. Then it performs an accurate atmospheric correction for about 100 AERONET sites based on accurate radiative transfer theory with high quality control of the input data. The ASRVN processing software consists of L1B data gridding algorithm, a new cloud mask algorithm based on a time series analysis, and an atmospheric correction algorithm. The atmospheric correction is achieved by fitting the MODIS top of atmosphere measurements, accumulated for 16-day interval, with theoretical reflectance parameterized in terms of coefficients of the LSRT BRF model. The ASRVN takes several steps to ensure high quality of results: 1) cloud mask algorithm filters opaque clouds; 2) an aerosol filter has been developed to filter residual semi-transparent and sub-pixel clouds, as well as cases with high inhomogeneity of aerosols in the processing area; 3) imposing requirement of consistency of the new solution with previously retrieved BRF and albedo; 4) rapid adjustment of the 16-day retrieval to the surface changes using the last day of measurements; and 5) development of seasonal back-up spectral BRF database to increase data coverage. The ASRVN provides a gapless or near-gapless coverage for the processing area. The gaps, caused by clouds, are filled most naturally with the latest solution for a given pixels. The ASRVN products include three parameters of LSRT model (k(sup L), k(sup G), k(sup V)), surface albedo, NBRF (a normalized BRF computed for a standard viewing geometry, VZA=0 deg., SZA=45 deg.), and IBRF (instantaneous, or one angle, BRF value derived from the last day of MODIS measurement for specific viewing geometry) for MODIS 500m bands 1-7. The results are produced daily at resolution of 1 km in gridded format. We also provide cloud mask, quality flag and a browse bitmap image. The new dataset can be used for a wide range of applications including validation analysis and science research.

Effects of 10 Hz and 20 Hz Transcranial Alternating Current Stimulation on Automatic Motor Control.

PubMed

Cappon, Davide; D'Ostilio, Kevin; Garraux, Gaëtan; Rothwell, John; Bisiacchi, Patrizia

2016-01-01

In a masked prime choice reaction task, presentation of a compatible prime increases the reaction time to the following imperative stimulus if the interval between mask and prime is around 80-250 ms. This is thought to be due to automatic suppression of the motor plan evoked by the prime, which delays reaction to the imperative stimulus. Oscillatory activity in motor networks around the beta frequency range of 20 Hz is important in suppression of movement. Transcranial alternating current at 20 Hz may be able to drive oscillations in the beta range. To investigate whether transcranial alternating current stimulation (tACS) at 20 Hz would increase automatic inhibition in a masked prime task. As a control we used 10 Hz tACS. Stimulation was delivered at alpha (10 Hz) and beta (20 Hz) frequency over the supplementary motor area and the primary motor cortex (simultaneous tACS of SMA-M1), which are part of the BG-cortical motor loop, during the execution of the subliminal masked prime left/right choice reaction task. We measured the effects on reaction times. Corticospinal excitability was assessed by measuring the amplitude of motor evoked potentials (MEPs) evoked in the first dorsal interosseous muscle by transcranial magnetic stimulation (TMS) over M1. The 10 and 20-Hz tACS over SMA-M1 had different effects on automatic inhibition. The 20 Hz tACS increased the duration of automatic inhibition whereas it was decreased by 10 Hz tACS. Neurophysiologically, 20 Hz tACS reduced the amplitude of MEPs evoked from M1, whereas there was no change after 10 Hz tACS. Automatic mechanisms of motor inhibition can be modulated by tACS over motor areas of cortex. tACS may be a useful additional tool to investigate the causal links between endogenous brain oscillations and specific cognitive processes. Copyright © 2016 Elsevier Inc. All rights reserved.

Cloud masking and removal in remote sensing image time series

NASA Astrophysics Data System (ADS)

Gómez-Chova, Luis; Amorós-López, Julia; Mateo-García, Gonzalo; Muñoz-Marí, Jordi; Camps-Valls, Gustau

2017-01-01

Automatic cloud masking of Earth observation images is one of the first required steps in optical remote sensing data processing since the operational use and product generation from satellite image time series might be hampered by undetected clouds. The high temporal revisit of current and forthcoming missions and the scarcity of labeled data force us to cast cloud screening as an unsupervised change detection problem in the temporal domain. We introduce a cloud screening method based on detecting abrupt changes along the time dimension. The main assumption is that image time series follow smooth variations over land (background) and abrupt changes will be mainly due to the presence of clouds. The method estimates the background surface changes using the information in the time series. In particular, we propose linear and nonlinear least squares regression algorithms that minimize both the prediction and the estimation error simultaneously. Then, significant differences in the image of interest with respect to the estimated background are identified as clouds. The use of kernel methods allows the generalization of the algorithm to account for higher-order (nonlinear) feature relations. After the proposed cloud masking and cloud removal, cloud-free time series at high spatial resolution can be used to obtain a better monitoring of land cover dynamics and to generate more elaborated products. The method is tested in a dataset with 5-day revisit time series from SPOT-4 at high resolution and with Landsat-8 time series. Experimental results show that the proposed method yields more accurate cloud masks when confronted with state-of-the-art approaches typically used in operational settings. In addition, the algorithm has been implemented in the Google Earth Engine platform, which allows us to access the full Landsat-8 catalog and work in a parallel distributed platform to extend its applicability to a global planetary scale.

Antireflective surface with a step in the taper: Numerical optimization and large-area fabrication

NASA Astrophysics Data System (ADS)

Shinotsuka, Kei; Hongo, Koki; Dai, Kotaro; Hirama, Satoru; Hatta, Yoshihisa

2017-02-01

In this study, we developed a practical method to improve the optical performance of subwavelength antireflective two-dimensional (2D) gratings. A numerical simulation of both convex and concave paraboloids suggested that surface reflectivity drastically decreases when a step is introduced in the taper. The optimum height and depth of a step provided average reflectances of 0.098% for convex protrusions and 0.040% for concave protrusions in the visible range. Furthermore, a stepped paraboloid was experimentally fabricated by dry etching of a Si substrate with SiO2 particle monolayer mask. A cyclo-olefin polymer (COP) reverse replica (concave) imprinted by the Si mold exhibited a measured reflectance of 0.077% on average in the visible range. It was also demonstrated that the antireflective structure was fabricated on the whole surface of a 6 in. Si wafer, which is a sufficient size for industrial utilization.

Electrostatic particle trap for ion beam sputter deposition

DOEpatents

Vernon, Stephen P.; Burkhart, Scott C.

2002-01-01

A method and apparatus for the interception and trapping of or reflection of charged particulate matter generated in ion beam sputter deposition. The apparatus involves an electrostatic particle trap which generates electrostatic fields in the vicinity of the substrate on which target material is being deposited. The electrostatic particle trap consists of an array of electrode surfaces, each maintained at an electrostatic potential, and with their surfaces parallel or perpendicular to the surface of the substrate. The method involves interception and trapping of or reflection of charged particles achieved by generating electrostatic fields in the vicinity of the substrate, and configuring the fields to force the charged particulate material away from the substrate. The electrostatic charged particle trap enables prevention of charged particles from being deposited on the substrate thereby enabling the deposition of extremely low defect density films, such as required for reflective masks of an extreme ultraviolet lithography (EUVL) system.

Variations in backward masking with different masking stimuli: II. The effects of spatially quantised masks in the light of local contour interaction, interchannel inhibition, perceptual retouch, and substitution theories.

PubMed

Bachmann, Talis; Luiga, Iiris; Põder, Endel

2005-01-01

In part I we showed that with spatially non-overlapping targets and masks both local metacontrast-like interactions and attentional processes are involved in backward masking. In this second part we extend the strategy of varying the contents of masks to pattern masking where targets and masks overlap in space, in order to compare different masking theories. Images of human faces were backward-masked by three types of spatially quantised masks (the same faces as targets, faces different from targets, and Gaussian noise with power spectra typical for faces). Configural characteristics, rather than the spectral content of the mask, predicted the extent of masking at relatively long stimulus onset asynchronies (SOAs). This poses difficulties for the theory of transient-on-sustained inhibition as the principal mechanism of masking and also for local contour interaction being a decisive factor in pattern masking. The scale of quantisation had no effect on the masking capacity of noise masks and a strong effect on the capacity of different-face masks. Also, the decrease of configural masking with an increase in the coarseness of the quantisation of the mask highlights ambiguities inherent in the re-entrance-based substitution theory of masking. Different masking theories cannot solve the problems of masking separately. They should be combined in order to create a complex, yet comprehensible mode of interaction for the different mechanisms involved in visual backward masking.

An improved algorithm for wildfire detection

NASA Astrophysics Data System (ADS)

Nakau, K.

2010-12-01

Satellite information of wild fire location has strong demands from society. Therefore, Understanding such demands is quite important to consider what to improve the wild fire detection algorithm. Interviews and considerations imply that the most important improvements are geographical resolution of the wildfire product and classification of fire; smoldering or flaming. Discussion with fire service agencies are performed with fire service agencies in Alaska and fire service volunteer groups in Indonesia. Alaska Fire Service (AFS) makes 3D-map overlaid by fire location every morning. Then, this 3D-map is examined by leaders of fire service teams to decide their strategy to fighting against wild fire. Especially, firefighters of both agencies seek the best walk path to approach the fire. Because of mountainous landscape, geospatial resolution is quite important for them. For example, walking in bush for 1km, as same as one pixel of fire product, is very tough for firefighters. Also, in case of remote wild fire, fire service agencies utilize satellite information to decide when to have a flight observation to confirm the status; expanding, flaming, smoldering or out. Therefore, it is also quite important to provide the classification of fire; flaming or smoldering. Not only the aspect of disaster management, wildfire emits huge amount of carbon into atmosphere as much as one quarter to one half of CO2 by fuel combustion (IPCC AR4). Reduction of the CO2 emission by human caused wildfire is important. To estimate carbon emission from wildfire, special resolution is quite important. To improve sensitivity of wild fire detection, author adopts radiance based wildfire detection. Different from the existing brightness temperature approach, we can easily consider reflectance of background land coverage. Especially for GCOM-C1/SGLI, band to detect fire with 250m resolution is 1.6μm wavelength. In this band, we have much more sunlight reflection. Therefore, we need to consider the way to cancel sunlight reflection. In this study, author utilizes simple linear correction for estimation of infrared emission considering sunlight reflection. As well as bran new core part of wildfire algorithm, we need to eliminate bright reflectance matters, including cloud, desert and sun glint. Also, we need to eliminate the false alarms at coastal area for difference of surface temperature between land and ocean. An existing algorithm MOD14 has same procedure, however, some of these ancillary parts are newly introduced or improved. Snow mask is newly introduced to reduce a bright reflectance with snow and ice covered area. Also, the improved ancillary parts include candidate selection of fire pixel, cloud mask, water body mask. With these improvements, wildfire with dense smoke or wildfire under thin cloud could be detected by this algorithm. This wild fire product is not validated by ground observations yet. However, distribution is well corresponded with wildfire location in same periods. Unfortunately, this algorithm also detects false alarm in urban area same as existing one. This should be corrected adopting other bands. Current algorithm will be performed in JASMES website.

The subjective experience of object recognition: comparing metacognition for object detection and object categorization.

PubMed

Meuwese, Julia D I; van Loon, Anouk M; Lamme, Victor A F; Fahrenfort, Johannes J

2014-05-01

Perceptual decisions seem to be made automatically and almost instantly. Constructing a unitary subjective conscious experience takes more time. For example, when trying to avoid a collision with a car on a foggy road you brake or steer away in a reflex, before realizing you were in a near accident. This subjective aspect of object recognition has been given little attention. We used metacognition (assessed with confidence ratings) to measure subjective experience during object detection and object categorization for degraded and masked objects, while objective performance was matched. Metacognition was equal for degraded and masked objects, but categorization led to higher metacognition than did detection. This effect turned out to be driven by a difference in metacognition for correct rejection trials, which seemed to be caused by an asymmetry of the distractor stimulus: It does not contain object-related information in the detection task, whereas it does contain such information in the categorization task. Strikingly, this asymmetry selectively impacted metacognitive ability when objective performance was matched. This finding reveals a fundamental difference in how humans reflect versus act on information: When matching the amount of information required to perform two tasks at some objective level of accuracy (acting), metacognitive ability (reflecting) is still better in tasks that rely on positive evidence (categorization) than in tasks that rely more strongly on an absence of evidence (detection).

A simultaneous multiple angle-wavelength dispersive X-ray reflectometer using a bent-twisted polychromator crystal

PubMed Central

Matsushita, Tadashi; Arakawa, Etsuo; Voegeli, Wolfgang; Yano, Yohko F.

2013-01-01

An X-ray reflectometer has been developed, which can simultaneously measure the whole specular X-ray reflectivity curve with no need for rotation of the sample, detector or monochromator crystal during the measurement. A bent-twisted crystal polychromator is used to realise a convergent X-ray beam which has continuously varying energy E (wavelength λ) and glancing angle α to the sample surface as a function of horizontal direction. This convergent beam is reflected in the vertical direction by the sample placed horizontally at the focus and then diverges horizontally and vertically. The normalized intensity distribution of the reflected beam measured downstream of the specimen with a two-dimensional pixel array detector (PILATUS 100K) represents the reflectivity curve. Specular X-ray reflectivity curves were measured from a commercially available silicon (100) wafer, a thin gold film coated on a silicon single-crystal substrate and the surface of liquid ethylene glycol with data collection times of 0.01 to 1000 s using synchrotron radiation from a bending-magnet source of a 6.5 GeV electron storage ring. A typical value of the simultaneously covered range of the momentum transfer was 0.01–0.45 Å−1 for the silicon wafer sample. The potential of this reflectometer for time-resolved X-ray studies of irreversible structural changes is discussed. PMID:23254659

The eye as a window to the listening brain: neural correlates of pupil size as a measure of cognitive listening load.

PubMed

Zekveld, Adriana A; Heslenfeld, Dirk J; Johnsrude, Ingrid S; Versfeld, Niek J; Kramer, Sophia E

2014-11-01

An important aspect of hearing is the degree to which listeners have to deploy effort to understand speech. One promising measure of listening effort is task-evoked pupil dilation. Here, we use functional magnetic resonance imaging (fMRI) to identify the neural correlates of pupil dilation during comprehension of degraded spoken sentences in 17 normal-hearing listeners. Subjects listened to sentences degraded in three different ways: the target female speech was masked by fluctuating noise, by speech from a single male speaker, or the target speech was noise-vocoded. The degree of degradation was individually adapted such that 50% or 84% of the sentences were intelligible. Control conditions included clear speech in quiet, and silent trials. The peak pupil dilation was larger for the 50% compared to the 84% intelligibility condition, and largest for speech masked by the single-talker masker, followed by speech masked by fluctuating noise, and smallest for noise-vocoded speech. Activation in the bilateral superior temporal gyrus (STG) showed the same pattern, with most extensive activation for speech masked by the single-talker masker. Larger peak pupil dilation was associated with more activation in the bilateral STG, bilateral ventral and dorsal anterior cingulate cortex and several frontal brain areas. A subset of the temporal region sensitive to pupil dilation was also sensitive to speech intelligibility and degradation type. These results show that pupil dilation during speech perception in challenging conditions reflects both auditory and cognitive processes that are recruited to cope with degraded speech and the need to segregate target speech from interfering sounds. Copyright © 2014 Elsevier Inc. All rights reserved.

Adhesive Systems as an Alternative Material for Color Masking of White Spot Lesions: Do They Work?

PubMed

de Lacerda, Ana Júlia Farias; da Silva Ávila, Daniele Mara; Borges, Alessandra Buhler; Pucci, Cesar Rogerio; Rocha Gomes Torres, Carlos

2016-01-01

To evaluate the color masking effect of infiltration treatment of artificial white spot lesions (AWSL) using a dedicated resin in comparison to different adhesive systems. Enamel/dentin specimens were obtained from bovine incisors and baseline color was assessed using a reflectance spectrophotometer, according to the CIE L*a*b* system. AWSL were produced using a buffered acid solution and a new color evaluation was performed. The specimens were divided into 8 groups: control: artificial saliva changed daily for 7 days; IC: infiltrating resin Icon; EC: EquiaCoat; FU: Futurabond U; SBU: Single Bond U; SBMP: Scotchbond MP; OB: OptibondFL; BF: Bioforty. After the treatments, the color was evaluated again and the values for the parameters ΔL (change in lightness), Δa (change in chroma), Δb (change in hue), and ΔE (general color difference) were calculated in relation to baseline. Data were analyzed by one-way ANOVA and Tukey's tests. After treatment, ANOVA showed significant differences for all parameters (p = 0.001). Tukey's test showed the greatest lightness reduction (ΔL) for the IC group, followed by EC, FU, and SBU. The SBMP, OB, and BF groups were similar to the control. For Δb values, all groups showed differences in relation to the control, with no differences between them. In relation to ΔE, all groups showed differences in relation to the control (ΔE = 5.24), with no significant differences between them. ΔE values after application of all resinous materials were lower than the threshold of 3.7, indicating effective color masking. The Icon infiltrant produced a greater lightness reduction of white lesions (ΔL). For general color difference (ΔE), all the resinous materials tested were able to color mask artificial AWSL.

Brain response to masked and unmasked facial emotions as a function of implicit and explicit personality self-concept of extraversion.

PubMed

Suslow, Thomas; Kugel, Harald; Lindner, Christian; Dannlowski, Udo; Egloff, Boris

2017-01-06

Extraversion-introversion is a personality dimension referring to individual differences in social behavior. In the past, neurobiological research on extraversion was almost entirely based upon questionnaires which inform about the explicit self-concept. Today, indirect measures are available that tap into the implicit self-concept of extraversion which is assumed to result from automatic processing functions. In our study, brain activation while viewing facial expression of affiliation relevant (i.e., happiness, and disgust) and irrelevant (i.e., fear) emotions was examined as a function of the implicit and explicit self-concept of extraversion and processing mode (automatic vs. controlled). 40 healthy volunteers watched blocks of masked and unmasked emotional faces while undergoing functional magnetic resonance imaging. The Implicit Association Test and the NEO Five-Factor Inventory were applied as implicit and explicit measures of extraversion which were uncorrelated in our sample. Implicit extraversion was found to be positively associated with neural response to masked happy faces in the thalamus and temporo-parietal regions and to masked disgust faces in cerebellar areas. Moreover, it was positively correlated with brain response to unmasked disgust faces in the amygdala and cortical areas. Explicit extraversion was not related to brain response to facial emotions when controlling trait anxiety. The implicit compared to the explicit self-concept of extraversion seems to be more strongly associated with brain activation not only during automatic but also during controlled processing of affiliation relevant facial emotions. Enhanced neural response to facial disgust could reflect high sensitivity to signals of interpersonal rejection in extraverts (i.e., individuals with affiliative tendencies). Copyright © 2016 IBRO. Published by Elsevier Ltd. All rights reserved.

What's in a mask? Information masking with forward and backward visual masks.

PubMed

Davis, Chris; Kim, Jeesun

2011-10-01

Three experiments tested how the physical format and information content of forward and backward masks affected the extent of visual pattern masking. This involved using different types of forward and backward masks with target discrimination measured by percentage correct in the first experiment (with a fixed target duration) and by an adaptive threshold procedure in the last two. The rationale behind the manipulation of the content of the masks stemmed from masking theories emphasizing attentional and/or conceptual factors rather than visual ones. Experiment 1 used word masks and showed that masking was reduced (a masking reduction effect) when the forward and backward masks were the same word (although in different case) compared to when the masks were different words. Experiment 2 tested the extent to which a reduction in masking might occur due to the physical similarity between the forward and backward masks by comparing the effect of the same content of the masks in the same versus different case. The result showed a significant reduction in masking for same content masks but no significant effect of case. The last experiment examined whether the reduction in masking effect would be observed with nonword masks--that is, having no high-level representation. No reduction in masking was found from same compared to different nonword masks (Experiment 3). These results support the view that the conscious perception of a rapidly displayed target stimulus is in part determined by high-level perceptual/cognitive factors concerned with masking stimulus grouping and attention.

FIRE Cirrus on October 28, 1986: LANDSAT; ER-2; King Air; theory

NASA Technical Reports Server (NTRS)

Wielicki, Bruce A.; Suttles, John T.; Heymsfield, Andrew J.; Welch, Ronald M.; Spinhirne, James D.; Parker, Lindsay; Arduini, Robert F.

1990-01-01

A simultaneous examination was conducted of cirrus clouds in the FIRE Cirrus IFO-I on 10/28/86 using a multitude of remote sensing and in-situ measurements. The focus is cirrus cloud radiative properties and their relationship to cloud microphysics. A key element is the comparison of radiative transfer model calculations and varying measured cirrus radiative properties (emissivity, reflectance vs. wavelength, reflectance vs. viewing angle). As the number of simultaneously measured cloud radiative properties and physical properties increases, more sharply focused tests of theoretical models are possible.

Simultaneous shape repulsion and global assimilation in the perception of aspect ratio

PubMed Central

Sweeny, Timothy D.; Grabowecky, Marcia; Suzuki, Satoru

2012-01-01

Although local interactions involving orientation and spatial frequency are well understood, less is known about spatial interactions involving higher level pattern features. We examined interactive coding of aspect ratio, a prevalent two-dimensional feature. We measured perception of two simultaneously flashed ellipses by randomly post-cueing one of them and having observers indicate its aspect ratio. Aspect ratios interacted in two ways. One manifested as an aspect-ratio-repulsion effect. For example, when a slightly tall ellipse and a taller ellipse were simultaneously flashed, the less tall ellipse appeared flatter and the taller ellipse appeared even taller. This repulsive interaction was long range, occurring even when the ellipses were presented in different visual hemifields. The other interaction manifested as a global assimilation effect. An ellipse appeared taller when it was a part of a global vertical organization than when it was a part of a global horizontal organization. The repulsion and assimilation effects temporally dissociated as the former slightly strengthened, and the latter disappeared when the ellipse-to-mask stimulus onset asynchrony was increased from 40 to 140 ms. These results are consistent with the idea that shape perception emerges from rapid lateral and hierarchical neural interactions. PMID:21248223

Simultaneous skull-stripping and lateral ventricle segmentation via fast multi-atlas likelihood fusion

NASA Astrophysics Data System (ADS)

Tang, Xiaoying; Kutten, Kwame; Ceritoglu, Can; Mori, Susumu; Miller, Michael I.

2015-03-01

In this paper, we propose and validate a fully automated pipeline for simultaneous skull-stripping and lateral ventricle segmentation using T1-weighted images. The pipeline is built upon a segmentation algorithm entitled fast multi-atlas likelihood-fusion (MALF) which utilizes multiple T1 atlases that have been pre-segmented into six whole-brain labels - the gray matter, the white matter, the cerebrospinal fluid, the lateral ventricles, the skull, and the background of the entire image. This algorithm, MALF, was designed for estimating brain anatomical structures in the framework of coordinate changes via large diffeomorphisms. In the proposed pipeline, we use a variant of MALF to estimate those six whole-brain labels in the test T1-weighted image. The three tissue labels (gray matter, white matter, and cerebrospinal fluid) and the lateral ventricles are then grouped together to form a binary brain mask to which we apply morphological smoothing so as to create the final mask for brain extraction. For computational purposes, all input images to MALF are down-sampled by a factor of two. In addition, small deformations are used for the changes of coordinates. This substantially reduces the computational complexity, hence we use the term "fast MALF". The skull-stripping performance is qualitatively evaluated on a total of 486 brain scans from a longitudinal study on Alzheimer dementia. Quantitative error analysis is carried out on 36 scans for evaluating the accuracy of the pipeline in segmenting the lateral ventricle. The volumes of the automated lateral ventricle segmentations, obtained from the proposed pipeline, are compared across three different clinical groups. The ventricle volumes from our pipeline are found to be sensitive to the diagnosis.

Simultaneous probing of bulk liquid phase and catalytic gas-liquid-solid interface under working conditions using attenuated total reflection infrared spectroscopy

DOE Office of Scientific and Technical Information (OSTI.GOV)

Meemken, Fabian; Müller, Philipp; Hungerbühler, Konrad

Design and performance of a reactor set-up for attenuated total reflection infrared (ATR-IR) spectroscopy suitable for simultaneous reaction monitoring of bulk liquid and catalytic solid-liquid-gas interfaces under working conditions are presented. As advancement of in situ spectroscopy an operando methodology for gas-liquid-solid reaction monitoring was developed that simultaneously combines catalytic activity and molecular level detection at the catalytically active site of the same sample. Semi-batch reactor conditions are achieved with the analytical set-up by implementing the ATR-IR flow-through cell in a recycle reactor system and integrating a specifically designed gas feeding system coupled with a bubble trap. By the usemore » of only one spectrometer the design of the new ATR-IR reactor cell allows for simultaneous detection of the bulk liquid and the catalytic interface during the working reaction. Holding two internal reflection elements (IRE) the sample compartments of the horizontally movable cell are consecutively flushed with reaction solution and pneumatically actuated, rapid switching of the cell (<1 s) enables to quasi simultaneously follow the heterogeneously catalysed reaction at the catalytic interface on a catalyst-coated IRE and in the bulk liquid on a blank IRE. For a complex heterogeneous reaction, the asymmetric hydrogenation of 2,2,2-trifluoroacetophenone on chirally modified Pt catalyst the elucidation of catalytic activity/enantioselectivity coupled with simultaneous monitoring of the catalytic solid-liquid-gas interface is shown. Both catalytic activity and enantioselectivity are strongly dependent on the experimental conditions. The opportunity to gain improved understanding by coupling measurements of catalytic performance and spectroscopic detection is presented. In addition, the applicability of modulation excitation spectroscopy and phase-sensitive detection are demonstrated.« less

Improved techniques reduce face mask leak during simulated neonatal resuscitation: study 2.

PubMed

Wood, Fiona E; Morley, Colin J; Dawson, Jennifer A; Kamlin, C Omar F; Owen, Louise S; Donath, Susan; Davis, Peter G

2008-05-01

Techniques of positioning and holding neonatal face masks vary. Studies have shown that leak at the face mask is common and often substantial irrespective of operator experience. (1) To identify a technique for face mask placement and hold which will minimise mask leak. (2) To investigate the effect of written instruction and demonstration of the identified technique on mask leak for two round face masks. Three experienced neonatologists compared methods of placing and holding face masks to minimise the leak for Fisher & Paykel 60 mm and Laerdal size 0/1 masks. 50 clinical staff gave positive pressure ventilation to a modified manikin designed to measure leak at the face mask. They were provided with written instructions on how to position and hold each mask and then received a demonstration. Face mask leak was measured after each teaching intervention. A technique of positioning and holding the face masks was identified which minimised leak. The mean (SD) mask leaks before instruction, after instruction and after demonstration were 55% (31), 49% (30), 33% (26) for the Laerdal mask and 57% (25), 47% (28), 32% (30) for the Fisher & Paykel mask. There was no significant difference in mask leak between the two masks. Written instruction alone reduced leak by 8.8% (CI 1.4% to 16.2%) for either mask; when combined with a demonstration mask leak was reduced by 24.1% (CI 16.4% to 31.8%). Written instruction and demonstration of the identified optimal technique resulted in significantly reduced face mask leak.

Retention of pediatric bag-mask ventilation efficacy skill by inexperienced medical student resuscitators using standard bag-mask ventilation masks, pocket masks, and blob masks.

PubMed

Kitagawa, Kory H; Nakamura, Nina M; Yamamoto, Loren

2006-03-01

To measure the ventilation efficacy with three single-sized mask types on infant and child manikin models. Medical students were recruited as study subjects inasmuch as they are inexperienced resuscitators. They were taught proper bag-mask ventilation (BMV) according to the American Heart Association guidelines on an infant and a child manikin. Subjects completed a BMV attempt successfully using the adult standard mask (to simulate the uncertainty of mask selection), pocket mask, and blob mask. Each attempt consisted of 5 ventilations assessed by chest rise of the manikin. Study subjects were asked which mask was easiest to use. Four to six weeks later, subjects repeated the procedure with no instructions (to simulate an emergency BMV encounter without immediate pre-encounter teaching). Forty-six volunteer subjects were studied. During the first attempt, subjects preferred the standard and blob masks over the pocket mask. For the second attempt, the blob mask was preferred over the standard mask, and few liked the pocket mask. Using the standard, blob, and pocket masks on the child manikin, 39, 42, and 20 subjects, respectively, were able to achieve adequate ventilation. Using the standard, blob, and pocket masks on the infant manikin, 45, 45, and 11 subjects, respectively, were able to achieve adequate ventilation. Both the standard and blob masks are more effective than the pocket mask at achieving adequate ventilation on infant and child manikins in this group of inexperienced medical student resuscitators, who most often preferred the blob mask.

Rates of initial acceptance of PAP masks and outcomes of mask switching.

PubMed

Bachour, Adel; Vitikainen, Pirjo; Maasilta, Paula

2016-05-01

Recently, we noticed a considerable development in alleviating problems related to positive airway pressure (PAP) masks. In this study, we report on the initial PAP mask acceptance rates and the effects of mask switching on mask-related symptoms. We prospectively collected all cases of mask switching in our sleep unit for a period of 14 months. At the time of the study, we used ResMed™ CPAP devices and masks. Mask switching was defined as replacing a mask used for at least 1 day with another type of mask. Changing to a different size but keeping the same type of mask did not count as mask switching. Switching outcomes were considered failed if the initial problem persisted or reappeared during the year that followed switching. Our patient pool was 2768. We recorded 343 cases of mask switching among 267 patients. Of the 566 patients who began new PAP therapy, 108 (39 women) had switched masks, yielding an initial mask acceptance rate of 81 %. The reason for switching was poor-fit/uncomfortable mask in 39 %, leak-related in 30 %, outdated model in 25 %, and nasal stuffiness in 6 % of cases; mask switching resolved these problems in 61 %. Mask switching occurred significantly (p = 0.037) more often in women and in new PAP users. The odds ratio for abandoning PAP therapy within 1 year after mask switching was 7.2 times higher (interval 4.7-11.1) than not switching masks. The initial PAP mask acceptance rate was high. Patients who switched their masks are at greater risk for abandoning PAP therapy.

Listeners Experience Linguistic Masking Release in Noise-Vocoded Speech-in-Speech Recognition.

PubMed

Viswanathan, Navin; Kokkinakis, Kostas; Williams, Brittany T

2018-02-15

The purpose of this study was to evaluate whether listeners with normal hearing perceiving noise-vocoded speech-in-speech demonstrate better intelligibility of target speech when the background speech was mismatched in language (linguistic release from masking [LRM]) and/or location (spatial release from masking [SRM]) relative to the target. We also assessed whether the spectral resolution of the noise-vocoded stimuli affected the presence of LRM and SRM under these conditions. In Experiment 1, a mixed factorial design was used to simultaneously manipulate the masker language (within-subject, English vs. Dutch), the simulated masker location (within-subject, right, center, left), and the spectral resolution (between-subjects, 6 vs. 12 channels) of noise-vocoded target-masker combinations presented at +25 dB signal-to-noise ratio (SNR). In Experiment 2, the study was repeated using a spectral resolution of 12 channels at +15 dB SNR. In both experiments, listeners' intelligibility of noise-vocoded targets was better when the background masker was Dutch, demonstrating reliable LRM in all conditions. The pattern of results in Experiment 1 was not reliably different across the 6- and 12-channel noise-vocoded speech. Finally, a reliable spatial benefit (SRM) was detected only in the more challenging SNR condition (Experiment 2). The current study is the first to report a clear LRM benefit in noise-vocoded speech-in-speech recognition. Our results indicate that this benefit is available even under spectrally degraded conditions and that it may augment the benefit due to spatial separation of target speech and competing backgrounds.

A developmental cycle masks output from the circadian oscillator under conditions of choline deficiency in Neurospora.

PubMed

Shi, Mi; Larrondo, Luis F; Loros, Jennifer J; Dunlap, Jay C

2007-12-11

In Neurospora, metabolic oscillators coexist with the circadian transcriptional/translational feedback loop governed by the FRQ (Frequency) and WC (White Collar) proteins. One of these, a choline deficiency oscillator (CDO) observed in chol-1 mutants grown under choline starvation, drives an uncompensated long-period developmental cycle ( approximately 60-120 h). To assess possible contributions of this metabolic oscillator to the circadian system, molecular and physiological rhythms were followed in liquid culture under choline starvation, but these only confirmed that an oscillator with a normal circadian period length can run under choline starvation. This finding suggested that long-period developmental cycles elicited by nutritional stress could be masking output from the circadian system, although a caveat was that the CDO sometimes requires several days to become consolidated. To circumvent this and observe both oscillators simultaneously, we used an assay using a codon-optimized luciferase to follow the circadian oscillator. Under conditions where the long-period, uncompensated, CDO-driven developmental rhythm was expressed for weeks in growth tubes, the luciferase rhythm in the same cultures continued in a typical compensated manner with a circadian period length dependent on the allelic state of frq. Periodograms revealed no influence of the CDO on the circadian oscillator. Instead, the CDO appears as a cryptic metabolic oscillator that can, under appropriate conditions, assume control of growth and development, thereby masking output from the circadian system. frq-driven luciferase as a reporter of the circadian oscillator may in this way provide a means for assessing prospective role(s) of metabolic and/or ancillary oscillators within cellular circadian systems.

Evaluation of selected auditory tests in school-age children suspected of auditory processing disorders.

PubMed

Vanniasegaram, Iyngaram; Cohen, Mazal; Rosen, Stuart

2004-12-01

To compare the auditory function of normal-hearing children attending mainstream schools who were referred for an auditory evaluation because of listening/hearing problems (suspected auditory processing disorders [susAPD]) with that of normal-hearing control children. Sixty-five children with a normal standard audiometric evaluation, ages 6-14 yr (32 of whom were referred for susAPD, with the rest age-matched control children), completed a battery of four auditory tests: a dichotic test of competing sentences; a simple discrimination of short tone pairs differing in fundamental frequency at varying interstimulus intervals (TDT); a discrimination task using consonant cluster minimal pairs of real words (CCMP), and an adaptive threshold task for detecting a brief tone presented either simultaneously with a masker (simultaneous masking) or immediately preceding it (backward masking). Regression analyses, including age as a covariate, were performed to determine the extent to which the performance of the two groups differed on each task. Age-corrected z-scores were calculated to evaluate the effectiveness of the complete battery in discriminating the groups. The performance of the susAPD group was significantly poorer than the control group on all but the masking tasks, which failed to differentiate the two groups. The CCMP discriminated the groups most effectively, as it yielded the lowest number of control children with abnormal scores, and performance in both groups was independent of age. By contrast, the proportion of control children who performed poorly on the competing sentences test was unacceptably high. Together, the CCMP (verbal) and TDT (nonverbal) tasks detected impaired listening skills in 56% of the children who were referred to the clinic, compared with 6% of the control children. Performance on the two tasks was not correlated. Two of the four tests evaluated, the CCMP and TDT, proved effective in differentiating the two groups of children of this study. The application of both tests increased the proportion of susAPD children who performed poorly compared with the application of each test alone, while reducing the proportion of control subjects who performed poorly. The findings highlight the importance of carrying out a complete auditory evaluation in children referred for medical attention, even if their standard audiometric evaluation is unremarkable.

New SHARE 2010 HSI-LiDAR dataset: re-calibration, detection assessment and delivery

NASA Astrophysics Data System (ADS)

Ientilucci, Emmett J.

2016-09-01

This paper revisits hyperspectral data collected from the SpecTIR hyperspectral airborne Rochester Experiment (SHARE) in 2010. It has been determined that there were calibration issues in the SWIR portion of the data. This calibration issue is discussed and has been rectified. Approaches for calibration to radiance and compensation to reflectance are discussed based on in-scene information and radiative transfer codes. In addition to the entire flight line, a much large target detection test and evaluation chip has been created which includes an abundance of potential false alarms. New truth masks are created along with results from target detection algorithms. Co-registered LiDAR data is also presented. Finally, all ground truth information (ground photos, metadata, MODTRAN tape5, ASD ground spectral measurements, target truth masks, etc.), in addition to the HSI flight lines and co-registered LiDAR data, has been organized, packaged and uploaded to the Center for Imaging Science / Digital Imaging and Remote Sensing Lab web server for public use.

Hiding true emotions: micro-expressions in eyes retrospectively concealed by mouth movements

PubMed Central

Iwasaki, Miho; Noguchi, Yasuki

2016-01-01

When we encounter someone we dislike, we may momentarily display a reflexive disgust expression, only to follow-up with a forced smile and greeting. Our daily lives are replete with a mixture of true and fake expressions. Nevertheless, are these fake expressions really effective at hiding our true emotions? Here we show that brief emotional changes in the eyes (micro-expressions, thought to reflect true emotions) can be successfully concealed by follow-up mouth movements (e.g. a smile). In the same manner as backward masking, mouth movements of a face inhibited conscious detection of all types of micro-expressions in that face, even when viewers paid full attention to the eye region. This masking works only in a backward direction, however, because no disrupting effect was observed when the mouth change preceded the eye change. These results provide scientific evidence for everyday behaviours like smiling to dissemble, and further clarify a major reason for the difficulty we face in discriminating genuine from fake emotional expressions. PMID:26915796

Hiding true emotions: micro-expressions in eyes retrospectively concealed by mouth movements.

PubMed

Iwasaki, Miho; Noguchi, Yasuki

2016-02-26

When we encounter someone we dislike, we may momentarily display a reflexive disgust expression, only to follow-up with a forced smile and greeting. Our daily lives are replete with a mixture of true and fake expressions. Nevertheless, are these fake expressions really effective at hiding our true emotions? Here we show that brief emotional changes in the eyes (micro-expressions, thought to reflect true emotions) can be successfully concealed by follow-up mouth movements (e.g. a smile). In the same manner as backward masking, mouth movements of a face inhibited conscious detection of all types of micro-expressions in that face, even when viewers paid full attention to the eye region. This masking works only in a backward direction, however, because no disrupting effect was observed when the mouth change preceded the eye change. These results provide scientific evidence for everyday behaviours like smiling to dissemble, and further clarify a major reason for the difficulty we face in discriminating genuine from fake emotional expressions.

Disguised Thyroid Disorders

PubMed Central

Tsao, John M.; Catz, Boris

1965-01-01

In six cases of hyperthyroidism and two of chronic thyroiditis herein described, the initial features of the diseases were misinterpreted as attributable to other kinds of illness such as myocardial infarction, gastrointestinal malignant disease, malabsorption syndrome, psychosis, simple exophthalmos and endemic goiter. The characteristic signs and symptoms of hyperthyroidism (in six patients) and chronic thyroiditis (in two patients) were present at the outset but were not identified. Intensive questioning and alertness were required to elicit these characteristics. The symptoms improved or disappeared after the true disease was controlled. In the studies of these cases, the usefulness of a number of laboratory tests was illustrated—thyroid suppression studies, 4 to 6-hour and 24-hour radioactive iodine uptake, T3 uptake by the red cells and determinations of 24-hour urine creatine, antithyroglobulin antibody titer and long-acting thyroid stimulating hormone. The manifestations of thyroid diseases are many and varied. The term “masked hyperthyroidism” may in part be a reflection of the “masked physician” unless he uses his clinical detective abilities. PMID:14347981

Why REM sleep? Clues beyond the laboratory in a more challenging world.

PubMed

Horne, Jim

2013-02-01

REM sleep (REM) seems more likely to prepare for ensuing wakefulness rather than provides recovery from prior wakefulness, as happens with 'deeper' nonREM. Many of REM's characteristics are 'wake-like' (unlike nonREM), including several common to feeding. These, with recent findings outside sleep, provide perspectives on REM beyond those from the laboratory. REM can interchange with a wakefulness involving motor output, indicating that REM's atonia is integral to its function. Wakefulness for 'wild' mammals largely comprises exploration; a complex opportunistic behaviour mostly for foraging, involving: curiosity, minimising risks, (emotional) coping, navigation, when (including circadian timing) to investigate new destinations; all linked to 'purposeful, goal directed movement'. REM reflects these adaptive behaviours (including epigenesis), masked in laboratories having constrained, safe, unchanging, unchallenging, featureless, exploration-free environments with ad lib food. Similarly masked may be REM's functions for today's humans living safe, routine lives, with easy food accessibility. In these respects animal and human REM studies are not sufficiently 'ecological'. Copyright © 2012 Elsevier B.V. All rights reserved.

Testing the efficacy of homemade masks: would they protect in an influenza pandemic?

PubMed

Davies, Anna; Thompson, Katy-Anne; Giri, Karthika; Kafatos, George; Walker, Jimmy; Bennett, Allan

2013-08-01

This study examined homemade masks as an alternative to commercial face masks. Several household materials were evaluated for the capacity to block bacterial and viral aerosols. Twenty-one healthy volunteers made their own face masks from cotton t-shirts; the masks were then tested for fit. The number of microorganisms isolated from coughs of healthy volunteers wearing their homemade mask, a surgical mask, or no mask was compared using several air-sampling techniques. The median-fit factor of the homemade masks was one-half that of the surgical masks. Both masks significantly reduced the number of microorganisms expelled by volunteers, although the surgical mask was 3 times more effective in blocking transmission than the homemade mask. Our findings suggest that a homemade mask should only be considered as a last resort to prevent droplet transmission from infected individuals, but it would be better than no protection.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Webb, Aaron P.; Carlson, Charles T.; Weaver, William T.

A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered ontomore » the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.« less

Donders revisited: Discrete or continuous temporal processing underlying reaction time distributions?

PubMed

Bao, Yan; Yang, Taoxi; Lin, Xiaoxiong; Pöppel, Ernst

2016-09-01

Differences of reaction times to specific stimulus configurations are used as indicators of cognitive processing stages. In this classical experimental paradigm, continuous temporal processing is implicitly assumed. Multimodal response distributions indicate, however, discrete time sampling, which is often masked by experimental conditions. Differences in reaction times reflect discrete temporal mechanisms that are pre-semantically implemented and suggested to be based on entrained neural oscillations. © 2016 The Institute of Psychology, Chinese Academy of Sciences and John Wiley & Sons Australia, Ltd.

Agricultural resources investigations in northern Italy and southern France (Agreste project). Part 1: Activity performed on the Italian test-sites

NASA Technical Reports Server (NTRS)

Megier, J. (Principal Investigator)

1976-01-01

The author has identified the following significant results. Some qualitative results were obtained out of the experiment of reflectance measurements under greenhouse conditions. An effort was made to correlate phenological stages, production, and radiometric measurements. It was found that the first order effect of exposure variability to sun irradiation is responsible for different rice productivity classes. Effects of rice variety and fertilization become second order, because they are completely masked by the first order effects.

Universal EUV in-band intensity detector

DOEpatents

Berger, Kurt W.

2004-08-24

Extreme ultraviolet light is detected using a universal in-band detector for detecting extreme ultraviolet radiation that includes: (a) an EUV sensitive photodiode having a diode active area that generates a current responsive to EUV radiation; (b) one or more mirrors that reflects EUV radiation having a defined wavelength(s) to the diode active area; and (c) a mask defining a pinhole that is positioned above the diode active area, wherein EUV radiation passing through the pinhole is restricted substantially to illuminating the diode active area.

Unclassified Publications of Lincoln Laboratory, Volume 10.

DTIC Science & Technology

1984-12-31

Plasma-Deposited Si 3N4 Turner, G.W. J. Electrochem. Soc., .’ - as an Oxidation Mask in the Connors, M.K. Vol. 131, No. 5, May Fabrication of GaAs 1984...Time Interval Counter 25-27 May 1982, to Obtain Phase pp. 4-1 - 4-4 6115 Complex Reflectivity and Goldner, R.B. SPIE, Vol. 401, Thin Film Refractive...Doublers with Series Courtney, W.E. Millimeter Wave Connected Varactor Diodes Mahoney, L.J. Monolithic Circuits "- - McClelland, R.W. Symp., Digest of

Method to repair localized amplitude defects in a EUV lithography mask blank

DOEpatents

Stearns, Daniel G.; Sweeney, Donald W.; Mirkarimi, Paul B.; Chapman, Henry N.

2005-11-22

A method and apparatus are provided for the repair of an amplitude defect in a multilayer coating. A significant number of layers underneath the amplitude defect are undamaged. The repair technique restores the local reflectivity of the coating by physically removing the defect and leaving a wide, shallow crater that exposes the underlying intact layers. The particle, pit or scratch is first removed the remaining damaged region is etched away without disturbing the intact underlying layers.

A cluster randomised trial of cloth masks compared with medical masks in healthcare workers

PubMed Central

MacIntyre, C Raina; Seale, Holly; Dung, Tham Chi; Hien, Nguyen Tran; Nga, Phan Thi; Chughtai, Abrar Ahmad; Rahman, Bayzidur; Dwyer, Dominic E; Wang, Quanyi

2015-01-01

Objective The aim of this study was to compare the efficacy of cloth masks to medical masks in hospital healthcare workers (HCWs). The null hypothesis is that there is no difference between medical masks and cloth masks. Setting 14 secondary-level/tertiary-level hospitals in Hanoi, Vietnam. Participants 1607 hospital HCWs aged ≥18 years working full-time in selected high-risk wards. Intervention Hospital wards were randomised to: medical masks, cloth masks or a control group (usual practice, which included mask wearing). Participants used the mask on every shift for 4 consecutive weeks. Main outcome measure Clinical respiratory illness (CRI), influenza-like illness (ILI) and laboratory-confirmed respiratory virus infection. Results The rates of all infection outcomes were highest in the cloth mask arm, with the rate of ILI statistically significantly higher in the cloth mask arm (relative risk (RR)=13.00, 95% CI 1.69 to 100.07) compared with the medical mask arm. Cloth masks also had significantly higher rates of ILI compared with the control arm. An analysis by mask use showed ILI (RR=6.64, 95% CI 1.45 to 28.65) and laboratory-confirmed virus (RR=1.72, 95% CI 1.01 to 2.94) were significantly higher in the cloth masks group compared with the medical masks group. Penetration of cloth masks by particles was almost 97% and medical masks 44%. Conclusions This study is the first RCT of cloth masks, and the results caution against the use of cloth masks. This is an important finding to inform occupational health and safety. Moisture retention, reuse of cloth masks and poor filtration may result in increased risk of infection. Further research is needed to inform the widespread use of cloth masks globally. However, as a precautionary measure, cloth masks should not be recommended for HCWs, particularly in high-risk situations, and guidelines need to be updated. Trial registration number Australian New Zealand Clinical Trials Registry: ACTRN12610000887077. PMID:25903751

A closer look at four-dot masking of a foveated target

PubMed Central

Wilson, Hugh R.

2016-01-01

Four-dot masking with a common onset mask was recently demonstrated in a fully attended and foveated target (Filmer, Mattingley & Dux, 2015). Here, we replicate and extend this finding by directly comparing a four-dot mask with an annulus mask while probing masking as a function of mask duration, and target-mask separation. Our results suggest that while an annulus mask operates via spatially local contour interactions, a four-dot mask operates through spatially global mechanisms. We also measure how the visual system’s representation of an oriented bar is impacted by a four-dot mask, and find that masking here does not degrade the precision of perceived targets, but instead appears to be driven exclusively by rendering the target completely invisible. PMID:27280073

Force-dependent static dead space of face masks used with holding chambers.

PubMed

Shah, Samir A; Berlinski, Ariel B; Rubin, Bruce K

2006-02-01

Pressurized metered-dose inhalers with valved holding chambers and masks are commonly used for aerosol delivery in children. Drug delivery can decrease when the dead-space volume (DSV) of the valved holding chamber is increased, but there are no published data evaluating force-dependent DSV among different masks. Seven masks were studied. Masks were sealed at the valved holding chamber end and filled with water to measure mask volume. To measure mask DSV we used a mannequin of 2-year-old-size face and we applied the mask with forces of 1.5, 3.5, and 7 pounds. Mask seal was determined by direct observation. Intra-brand analysis was done via analysis of variance. At 3.5 pounds of force, the DSV ranged from 29 mL to 100 mL, with 3 masks having DSV of < 50 mL. The remaining masks all had DSV > 60 mL. At 3.5 pounds of force, DSV percent of mask volume ranged from 33.7% (Aerochamber, p < 0.01 compared with other masks) to 100% (Pocket Chamber). DSV decreased with increasing force with most of the masks, and the slope of this line was inversely proportional to mask flexibility. Mask fit was 100% at 1.5 pounds of force only with the Aerochamber and Optichamber. Mask fit was poorest with the Vortex, Pocket Chamber, and BreatheRite masks. Rigid masks with large DSV might not be not suitable for use in children, especially if discomfort from the stiff mask makes its use less acceptable to the child.

Influence of mask type and mask position on the effectiveness of bag-mask ventilation in a neonatal manikin.

PubMed

Deindl, Philipp; O'Reilly, Megan; Zoller, Katharina; Berger, Angelika; Pollak, Arnold; Schwindt, Jens; Schmölzer, Georg M

2014-01-01

Anatomical face mask with an air cushion rim might be placed accidentally in a false orientation on the newborn's face or filled with various amounts of air during neonatal resuscitation. Both false orientation as well as variable filling may reduce a tight seal and therefore hamper effective positive pressure ventilation (PPV). We aimed to measure the influence of mask type and mask position on the effectiveness of PPV. Twenty neonatal staff members delivered PPV to a modified, leak-free manikin. Resuscitation parameters were recorded using a self-inflatable bag PPV with an Intersurgical anatomical air cushion rim face mask (IS) and a size 0/1 Laerdal round face mask. Three different positions of the IS were tested: correct position, 90° and 180° rotation in reference to the midline of the face. IS masks in each correct position on the face but with different inflation of the air cushion (empty, 10, 20 and 30 mL). Mask leak was similar with mask rotation to either 90° or 180° but significantly increased from 27 (13-73) % with an adequate filled IS mask compared to 52 (16-83) % with an emptied air cushion rim. Anatomical-shaped face mask had similar mask leaks compared to round face mask. A wrongly positioned anatomical-shaped mask does not influence mask leak. Mask leak significantly increased once the air cushion rim was empty, which may cause failure in mask PPV.

Digital sun sensor multi-spot operation.

PubMed

Rufino, Giancarlo; Grassi, Michele

2012-11-28

The operation and test of a multi-spot digital sun sensor for precise sun-line determination is described. The image forming system consists of an opaque mask with multiple pinhole apertures producing multiple, simultaneous, spot-like images of the sun on the focal plane. The sun-line precision can be improved by averaging multiple simultaneous measures. Nevertheless, the sensor operation on a wide field of view requires acquiring and processing images in which the number of sun spots and the related intensity level are largely variable. To this end, a reliable and robust image acquisition procedure based on a variable shutter time has been considered as well as a calibration function exploiting also the knowledge of the sun-spot array size. Main focus of the present paper is the experimental validation of the wide field of view operation of the sensor by using a sensor prototype and a laboratory test facility. Results demonstrate that it is possible to keep high measurement precision also for large off-boresight angles.

A risk-adjusted O-E CUSUM with monitoring bands for monitoring medical outcomes.

PubMed

Sun, Rena Jie; Kalbfleisch, John D

2013-03-01

In order to monitor a medical center's survival outcomes using simple plots, we introduce a risk-adjusted Observed-Expected (O-E) Cumulative SUM (CUSUM) along with monitoring bands as decision criterion.The proposed monitoring bands can be used in place of a more traditional but complicated V-shaped mask or the simultaneous use of two one-sided CUSUMs. The resulting plot is designed to simultaneously monitor for failure time outcomes that are "worse than expected" or "better than expected." The slopes of the O-E CUSUM provide direct estimates of the relative risk (as compared to a standard or expected failure rate) for the data being monitored. Appropriate rejection regions are obtained by controlling the false alarm rate (type I error) over a period of given length. Simulation studies are conducted to illustrate the performance of the proposed method. A case study is carried out for 58 liver transplant centers. The use of CUSUM methods for quality improvement is stressed. Copyright © 2013, The International Biometric Society.

Orientation tuning of contrast masking caused by motion streaks.

PubMed

Apthorp, Deborah; Cass, John; Alais, David

2010-08-01

We investigated whether the oriented trails of blur left by fast-moving dots (i.e., "motion streaks") effectively mask grating targets. Using a classic overlay masking paradigm, we varied mask contrast and target orientation to reveal underlying tuning. Fast-moving Gaussian blob arrays elevated thresholds for detection of static gratings, both monoptically and dichoptically. Monoptic masking at high mask (i.e., streak) contrasts is tuned for orientation and exhibits a similar bandwidth to masking functions obtained with grating stimuli (∼30 degrees). Dichoptic masking fails to show reliable orientation-tuned masking, but dichoptic masks at very low contrast produce a narrowly tuned facilitation (∼17 degrees). For iso-oriented streak masks and grating targets, we also explored masking as a function of mask contrast. Interestingly, dichoptic masking shows a classic "dipper"-like TVC function, whereas monoptic masking shows no dip and a steeper "handle". There is a very strong unoriented component to the masking, which we attribute to transiently biased temporal frequency masking. Fourier analysis of "motion streak" images shows interesting differences between dichoptic and monoptic functions and the information in the stimulus. Our data add weight to the growing body of evidence that the oriented blur of motion streaks contributes to the processing of fast motion signals.

Effect of SPM-based cleaning POR on EUV mask performance

NASA Astrophysics Data System (ADS)

Choi, Jaehyuck; Lee, Han-shin; Yoon, Jinsang; Shimomura, Takeya; Friz, Alex; Montgomery, Cecilia; Ma, Andy; Goodwin, Frank; Kang, Daehyuk; Chung, Paul; Shin, Inkyun; Cho, H.

2011-11-01

EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality and patterning performance can change during mask fabrication, EUV exposure, maintenance cleaning, shipping, or storage. The fact that a pellicle is not used to protect the mask surface in EUV lithography suggests that EUV masks may have to undergo more cleaning cycles during their lifetime. More frequent cleaning, combined with the adoption of new materials for EUV masks, necessitates that mask manufacturers closely examine the performance change of EUV masks during cleaning process. We have investigated EUV mask quality and patterning performance during 30 cycles of Samsung's EUV mask SPM-based cleaning and 20 cycles of SEMATECH ADT exposure. We have observed that the quality and patterning performance of EUV masks does not significantly change during these processes except mask pattern CD change. To resolve this issue, we have developed an acid-free cleaning POR and substantially improved EUV mask film loss compared to the SPM-based cleaning POR.

Ultra narrow flat-top filter based on multiple equivalent phase shifts

NASA Astrophysics Data System (ADS)

Wang, Fei; Zou, Xihua; Yin, Zuowei; Chen, Xiangfei; Shen, Haisong

2008-11-01

Instead of real phase shifts, equivalent phase shifts (EPS) are adopted to construct ultra narrow phase-shifted band-pass filer in sampled Bragg gratings (SBG). Two optimized distributions of multiple equivalent phase shifts, using 2 and 5 EPSs respectively, are given in this paper to realize flat-top and ripple-free transmission characteristics simultaneously. Also two demonstrations with 5 EPSs both on hydrogen-loaded and photosensitive fibers are presented and their spectrums are examined by an optical vector analyzer (OVA). Given only ordinary phase mask and sub-micrometer precision control, ultra-narrowband flat-top filters with expected performance can be achieved flexibly and cost-effectively.

On Optimizing H. 264/AVC Rate Control by Improving R-D Model and Incorporating HVS Characteristics

NASA Astrophysics Data System (ADS)

Zhu, Zhongjie; Wang, Yuer; Bai, Yongqiang; Jiang, Gangyi

2010-12-01

The state-of-the-art JVT-G012 rate control algorithm of H.264 is improved from two aspects. First, the quadratic rate-distortion (R-D) model is modified based on both empirical observations and theoretical analysis. Second, based on the existing physiological and psychological research findings of human vision, the rate control algorithm is optimized by incorporating the main characteristics of the human visual system (HVS) such as contrast sensitivity, multichannel theory, and masking effect. Experiments are conducted, and experimental results show that the improved algorithm can simultaneously enhance the overall subjective visual quality and improve the rate control precision effectively.

Matrix-addressed analog ferroelectric memory

NASA Astrophysics Data System (ADS)

Lemons, R. A.; Grogan, J. K.; Thompson, J. S.

1980-08-01

A matrix addressed analog memory which uses multiple ferroelectric domain walls to address columns of words, is demonstrated. It is shown that the analog information is stored as a pattern in the metallization on the surface of the crystal, making a read-only memory. The pattern is done photolithographically in a way compatible with the simultaneous fabrication of many devices. Attention is given to the performance results, noting that the advantage of the device is that analog information can be stored with a high density in a single mask step. Finally, it is shown that potential applications are in systems which require repetitive output from a limited vocabulary of spoken words.

A human auditory tuning curves matched wavelet function.

PubMed

Abolhassani, Mohammad D; Salimpour, Yousef

2008-01-01

This paper proposes a new quantitative approach to the problem of matching a wavelet function to a human auditory tuning curves. The auditory filter shapes were derived from the psychophysical measurements in normal-hearing listeners using the variant of the notched-noise method for brief signals in forward and simultaneous masking. These filters were used as templates for the designing a wavelet function that has the maximum matching to a tuning curve. The scaling function was calculated from the matched wavelet function and by using these functions, low pass and high pass filters were derived for the implementation of a filter bank. Therefore, new wavelet families were derived.

The role of auditory and kinaesthetic feedback mechanisms on phonatory stability in children.

PubMed

Rathna Kumar, S B; Azeem, Suhail; Choudhary, Abhishek Kumar; Prakash, S G R

2013-12-01

Auditory feedback plays an important role in phonatory control. When auditory feedback is disrupted, various changes are observed in vocal motor control. Vocal intensity and fundamental frequency (F0) levels tend to increase in response to auditory masking. Because of the close reflexive links between the auditory and phonatory systems, it is likely that phonatory stability may be disrupted when auditory feedback is disrupted or altered. However, studies on phonatory stability under auditory masking condition in adult subjects showed that most of the subjects maintained normal levels of phonatory stability. The authors in the earlier investigations suggested that auditory feedback is not the sole contributor to vocal motor control and phonatory stability, a complex neuromuscular reflex system known as kinaesthetic feedback may play a role in controlling phonatory stability when auditory feedback is disrupted or lacking. This proposes the need to further investigate this phenomenon as to whether children show similar patterns of phonatory stability under auditory masking since their neuromotor systems are still at developmental stage, less mature and are less resistant to altered auditory feedback than adults. A total of 40 normal hearing and speaking children (20 male and 20 female) between the age group of 6 and 8 years participated as subjects. The acoustic parameters such as shimmer, jitter and harmonic-to-noise ratio (HNR) were measures and compared between no masking condition (0 dB ML) and masking condition (90 dB ML). Despite the neuromotor systems being less mature in children and less resistant than adults to altered auditory feedback, most of the children in the study demonstrated increased phonatory stability which was reflected by reduced shimmer, jitter and increased HNR values. This study implicates that most of the children demonstrate well established patterns of kinaesthetic feedback, which might have allowed them to maintain normal levels of vocal motor control even in the presence of disturbed auditory feedback. Hence, it can be concluded that children also exhibit kinaesthetic feedback mechanism to control phonatory stability when auditory feedback is disrupted which in turn highlights the importance of kinaesthetic feedback to be included in the therapeutic/intervention approaches for children with hearing and neurogenic speech deficits.

Rapid estimation of high-parameter auditory-filter shapes

PubMed Central

Shen, Yi; Sivakumar, Rajeswari; Richards, Virginia M.

2014-01-01

A Bayesian adaptive procedure, the quick-auditory-filter (qAF) procedure, was used to estimate auditory-filter shapes that were asymmetric about their peaks. In three experiments, listeners who were naive to psychoacoustic experiments detected a fixed-level, pure-tone target presented with a spectrally notched noise masker. The qAF procedure adaptively manipulated the masker spectrum level and the position of the masker notch, which was optimized for the efficient estimation of the five parameters of an auditory-filter model. Experiment I demonstrated that the qAF procedure provided a convergent estimate of the auditory-filter shape at 2 kHz within 150 to 200 trials (approximately 15 min to complete) and, for a majority of listeners, excellent test-retest reliability. In experiment II, asymmetric auditory filters were estimated for target frequencies of 1 and 4 kHz and target levels of 30 and 50 dB sound pressure level. The estimated filter shapes were generally consistent with published norms, especially at the low target level. It is known that the auditory-filter estimates are narrower for forward masking than simultaneous masking due to peripheral suppression, a result replicated in experiment III using fewer than 200 qAF trials. PMID:25324086

Reading aloud in Persian: ERP evidence for an early locus of the masked onset priming effect.

PubMed

Timmer, Kalinka; Vahid-Gharavi, Narges; Schiller, Niels O

2012-07-01

The current study investigates reading aloud words in Persian, a language that does not mark all its vowels in the script. Behaviorally, a masked onset priming effect (MOPE) was revealed for transparent words, with faster speech onset latencies in the phoneme-matching condition (i.e. phonological prime and target onset overlap; e.g. [symbol: see text] /sɒːl/; 'year' [symbol: see text] /sot/; 'voice') than the phoneme-mismatching condition (e.g. [symbol: see text] /tɒːb/ 'swing' - [symbol: see text] /sot/; 'voice'). For opaque target words (e.g. [symbol: see text] /solh/; 'peace'), no such effect was found. However, event-related potentials (ERPs) did reveal an amplitude difference between the two prime conditions in the 80-160 ms time window for transparent as well as opaque words. Only for the former, this effect continued into the 300-480 ms time window. This finding constrains the time course of the MOPE and suggests the simultaneous activation of both the non-lexical grapheme-to-phoneme and the lexical route in the dual-route cascaded (DRC) model. Copyright © 2012 Elsevier Inc. All rights reserved.

Joint seismic data denoising and interpolation with double-sparsity dictionary learning

NASA Astrophysics Data System (ADS)

Zhu, Lingchen; Liu, Entao; McClellan, James H.

2017-08-01

Seismic data quality is vital to geophysical applications, so that methods of data recovery, including denoising and interpolation, are common initial steps in the seismic data processing flow. We present a method to perform simultaneous interpolation and denoising, which is based on double-sparsity dictionary learning. This extends previous work that was for denoising only. The original double-sparsity dictionary learning algorithm is modified to track the traces with missing data by defining a masking operator that is integrated into the sparse representation of the dictionary. A weighted low-rank approximation algorithm is adopted to handle the dictionary updating as a sparse recovery optimization problem constrained by the masking operator. Compared to traditional sparse transforms with fixed dictionaries that lack the ability to adapt to complex data structures, the double-sparsity dictionary learning method learns the signal adaptively from selected patches of the corrupted seismic data, while preserving compact forward and inverse transform operators. Numerical experiments on synthetic seismic data indicate that this new method preserves more subtle features in the data set without introducing pseudo-Gibbs artifacts when compared to other directional multi-scale transform methods such as curvelets.

A cluster randomised trial of cloth masks compared with medical masks in healthcare workers.

PubMed

MacIntyre, C Raina; Seale, Holly; Dung, Tham Chi; Hien, Nguyen Tran; Nga, Phan Thi; Chughtai, Abrar Ahmad; Rahman, Bayzidur; Dwyer, Dominic E; Wang, Quanyi

2015-04-22

The aim of this study was to compare the efficacy of cloth masks to medical masks in hospital healthcare workers (HCWs). The null hypothesis is that there is no difference between medical masks and cloth masks. 14 secondary-level/tertiary-level hospitals in Hanoi, Vietnam. 1607 hospital HCWs aged ≥18 years working full-time in selected high-risk wards. Hospital wards were randomised to: medical masks, cloth masks or a control group (usual practice, which included mask wearing). Participants used the mask on every shift for 4 consecutive weeks. Clinical respiratory illness (CRI), influenza-like illness (ILI) and laboratory-confirmed respiratory virus infection. The rates of all infection outcomes were highest in the cloth mask arm, with the rate of ILI statistically significantly higher in the cloth mask arm (relative risk (RR)=13.00, 95% CI 1.69 to 100.07) compared with the medical mask arm. Cloth masks also had significantly higher rates of ILI compared with the control arm. An analysis by mask use showed ILI (RR=6.64, 95% CI 1.45 to 28.65) and laboratory-confirmed virus (RR=1.72, 95% CI 1.01 to 2.94) were significantly higher in the cloth masks group compared with the medical masks group. Penetration of cloth masks by particles was almost 97% and medical masks 44%. This study is the first RCT of cloth masks, and the results caution against the use of cloth masks. This is an important finding to inform occupational health and safety. Moisture retention, reuse of cloth masks and poor filtration may result in increased risk of infection. Further research is needed to inform the widespread use of cloth masks globally. However, as a precautionary measure, cloth masks should not be recommended for HCWs, particularly in high-risk situations, and guidelines need to be updated. Australian New Zealand Clinical Trials Registry: ACTRN12610000887077. Published by the BMJ Publishing Group Limited. For permission to use (where not already granted under a licence) please go to http://group.bmj.com/group/rights-licensing/permissions.

Clay Mask Workshop

ERIC Educational Resources Information Center

Gamble, David L.

2012-01-01

Masks can represent so many things, such as emotions (happy, sad, fearful) and power. The familiar "comedy and tragedy" masks, derived from ancient Greek theater, are just one example from mask history. Death masks from the ancient Egyptians influenced the ancient Romans into creating similar masks for their departed. Masks can represent many…

Extension of optical lithography by mask-litho integration with computational lithography

NASA Astrophysics Data System (ADS)

Takigawa, T.; Gronlund, K.; Wiley, J.

2010-05-01

Wafer lithography process windows can be enlarged by using source mask co-optimization (SMO). Recently, SMO including freeform wafer scanner illumination sources has been developed. Freeform sources are generated by a programmable illumination system using a micro-mirror array or by custom Diffractive Optical Elements (DOE). The combination of freeform sources and complex masks generated by SMO show increased wafer lithography process window and reduced MEEF. Full-chip mask optimization using source optimized by SMO can generate complex masks with small variable feature size sub-resolution assist features (SRAF). These complex masks create challenges for accurate mask pattern writing and low false-defect inspection. The accuracy of the small variable-sized mask SRAF patterns is degraded by short range mask process proximity effects. To address the accuracy needed for these complex masks, we developed a highly accurate mask process correction (MPC) capability. It is also difficult to achieve low false-defect inspections of complex masks with conventional mask defect inspection systems. A printability check system, Mask Lithography Manufacturability Check (M-LMC), is developed and integrated with 199-nm high NA inspection system, NPI. M-LMC successfully identifies printable defects from all of the masses of raw defect images collected during the inspection of a complex mask. Long range mask CD uniformity errors are compensated by scanner dose control. A mask CD uniformity error map obtained by mask metrology system is used as input data to the scanner. Using this method, wafer CD uniformity is improved. As reviewed above, mask-litho integration technology with computational lithography is becoming increasingly important.

Diffuse characteristics study of laser target board using Monte Carlo simulation

NASA Astrophysics Data System (ADS)

Yang, Pengling; Wu, Yong; Wang, Zhenbao; Tao, Mengmeng; Wu, Junjie; Wang, Ping; Yan, Yan; Zhang, Lei; Feng, Gang; Zhu, Jinghui; Feng, Guobin

2013-05-01

In this paper, Torrance-Sparrow and Oren-Nayar model is adopt to study diffuse characteristics of laser target board. The model which based on geometric optics, assumes that rough surfaces are made up of a series of symmetric V-groove cavities with different slopes at microscopic level. The distribution of the slopes of the V-grooves are modeled as beckman distribution function, and every microfacet of the V-groove cavity is assumed to behave like a perfect mirror, which means the reflected ray follows Fresnel law at the microfacet. The masking and shadowing effects of rough surface are also taken into account through geometric attenuation factor. Monte Carlo method is used to simulate the diffuse reflectance distribution of the laser target board with different materials and processing technology, and all the calculated results are verified by experiment. It is shown that the profile of bidirectional reflectance distribution curve is lobe-shaped with the maximum lies along the mirror reflection direction. The width of the profile is narrower for a lower roughness value, and broader for a higher roughness value. The refractive index of target material will also influence the intensity and distribution of diffuse reflectance of laser target surface.

Flat-plate solar array project process development area, process research of non-CZ silicon material

NASA Technical Reports Server (NTRS)

Campbell, R. B.

1984-01-01

The program is designed to investigate the fabrication of solar cells on N-type base material by a simultaneous diffusion of N-type and P-type dopants to form an P(+)NN(+) structure. The results of simultaneous diffusion experiments are being compared to cells fabricated using sequential diffusion of dopants into N-base material in the same resistivity range. The process used for the fabrication of the simultaneously diffused P(+)NN(+) cells follows the standard Westinghouse baseline sequence for P-base material except that the two diffusion processes (boron and phosphorus) are replaced by a single diffusion step. All experiments are carried out on N-type dendritic web grown in the Westinghouse pre-pilot facility. The resistivities vary from 0.5 (UC OMEGA)cm to 5 (UC OMEGA)cm. The dopant sources used for both the simultaneous and sequential diffusion experiments are commercial metallorganic solutions with phosphorus or boron components. After these liquids are applied to the web surface, they are baked to form a hard glass which acts as a diffusion source at elevated temperatures. In experiments performed thus far, cells produced in sequential diffusion tests have properties essentially equal to the baseline N(+)PP(+) cells. However, the simultaneous diffusions have produced cells with much lower IV characteristics mainly due to cross-doping of the sources at the diffusion temperature. This cross-doping is due to the high vapor pressure phosphorus (applied as a metallorganic to the back surface) diffusion through the SiO2 mask and then acting as a diffusant source for the front surface.

Effect of etching parameters on antireflection properties of Si subwavelength grating structures for solar cell applications

NASA Astrophysics Data System (ADS)

Leem, J. W.; Song, Y. M.; Lee, Y. T.; Yu, J. S.

2010-09-01

Silicon (Si) subwavelength grating (SWG) structures were fabricated on Si substrates by holographic lithography and subsequent inductively coupled plasma (ICP) etching process using SiCl4 with or without Ar addition for solar cell applications. To ensure a good nanosized pattern transfer into the underlying Si layer, the etch selectivity of Si over the photoresist mask is optimized by varying the etching parameters, thus improving antireflection characteristics. For antireflection analysis of Si SWG surfaces, the optical reflectivity is measured experimentally and it is also calculated theoretically by a rigorous coupled-wave analysis. The reflectance depends on the height, period, and shape of two-dimensional periodic Si subwavelength structures, correlated with ICP etching parameters. The optimized Si SWG structure exhibits a dramatic decrease in optical reflection of the Si surface over a wide angle of incident light ( θ i ), i.e. less than 5% at wavelengths of 300-1100 nm, leading to good wide-angle antireflection characteristics (i.e. solar-weighted reflection of 1.7-4.9% at θ i <50°) of Si solar cells.

Method of making and structure for monolithic optical circuits

NASA Technical Reports Server (NTRS)

Evanchuk, Vincent L. (Inventor)

1983-01-01

A method for making monolithic optical circuits, with related optical devices as required or desired, on a supporting surface (10) consists of coating the supporting surface with reflecting metal or cladding resin, spreading a layer of liquid radiation senstivie plastic (12) on the surface, exposing the liquid plastic with a mask (14) to cure it in a desired pattern of light conductors (16, 18, 20), washing away the unexposed liquid plastic, and coating the conductors thus formed with reflective metal or cladding resin. The index of refraction for the cladding (22) is selected to be lower than for the conductors so that light in the conductors will be reflected by the interface with the cladding. For multiple level conductors, as where one conductor must cross over another, the process may be repeated to fabricate a bridge with columns (24, 26) of conductors to the next level, and conductor (28) between the columns. For more efficient transfer of energy over the bridge, faces at 45.degree. may be formed to reflect light up and across the bridge.

venice: Mask utility

NASA Astrophysics Data System (ADS)

Coupon, Jean

2018-02-01

venice reads a mask file (DS9 or fits type) and a catalogue of objects (ascii or fits type) to create a pixelized mask, find objects inside/outside a mask, or generate a random catalogue of objects inside/outside a mask. The program reads the mask file and checks if a point, giving its coordinates, is inside or outside the mask, i.e. inside or outside at least one polygon of the mask.

Pattern masking: the importance of remote spatial frequencies and their phase alignment.

PubMed

Huang, Pi-Chun; Maehara, Goro; May, Keith A; Hess, Robert F

2012-02-16

To assess the effects of spatial frequency and phase alignment of mask components in pattern masking, target threshold vs. mask contrast (TvC) functions for a sine-wave grating (S) target were measured for five types of mask: a sine-wave grating (S), a square-wave grating (Q), a missing fundamental square-wave grating (M), harmonic complexes consisting of phase-scrambled harmonics of a square wave (Qp), and harmonic complexes consisting of phase-scrambled harmonics of a missing fundamental square wave (Mp). Target and masks had the same fundamental frequency (0.46 cpd) and the target was added in phase with the fundamental frequency component of the mask. Under monocular viewing conditions, the strength of masking depends on phase relationships among mask spatial frequencies far removed from that of the target, at least 3 times the target frequency, only when there are common target and mask spatial frequencies. Under dichoptic viewing conditions, S and Q masks produced similar masking to each other and the phase-scrambled masks (Qp and Mp) produced less masking. The results suggest that pattern masking is spatial frequency broadband in nature and sensitive to the phase alignments of spatial components.

Visuo-Spatial Processing and Executive Functions in Children with Specific Language Impairment

ERIC Educational Resources Information Center

Marton, Klara

2008-01-01

Background: Individual differences in complex working memory tasks reflect simultaneous processing, executive functions, and attention control. Children with specific language impairment (SLI) show a deficit in verbal working memory tasks that involve simultaneous processing of information. Aims: The purpose of the study was to examine executive…

Object Substitution Masking: When Does Mask Preview Work?

ERIC Educational Resources Information Center

Lim, Stephen Wee Hun; Chua, Fook K.

2008-01-01

When a target is enclosed by a 4-dot mask that persists after the target disappears, target identification is worse than it is when the mask terminates with the target. This masking effect is attributed to object substitution masking (OSM). Previewing the mask, however, attenuates OSM. This study investigated specific conditions under which mask…

Comparison of face masks in the bag-mask ventilation of a manikin.

PubMed

Redfern, D; Rassam, S; Stacey, M R; Mecklenburgh, J S

2006-02-01

We conducted a study investigating the effectiveness of four face mask designs in the bag-mask ventilation of a special manikin adapted to simulate a difficult airway. Forty-eight anaesthetists volunteered to bag-mask ventilate the manikin for 3 min with four different face masks. The primary outcome of the study was to calculate mean percentage leak from the face masks over 3 min. Anaesthetists were also asked to rate the face masks using a visual analogue score. The single-use scented intersurgical face mask had the lowest mean leak (20%). This was significantly lower than the mean leak from the single-use, cushioned 7,000 series Air Safety Ltd. face mask (24%) and the reusable silicone Laerdal face mask (27%) but not significantly lower than the mean leak from the reusable anatomical intersurgical face mask (23%). There was a large variation in both performance and satisfaction between anaesthetists with each design. This highlights the importance of having a variety of face masks available for emergency use.

Oronasal Masks Require a Higher Pressure than Nasal and Nasal Pillow Masks for the Treatment of Obstructive Sleep Apnea.

PubMed

Deshpande, Sheetal; Joosten, Simon; Turton, Anthony; Edwards, Bradley A; Landry, Shane; Mansfield, Darren R; Hamilton, Garun S

2016-09-15

Oronasal masks are frequently used for continuous positive airway pressure (CPAP) treatment in patients with obstructive sleep apnea (OSA). The aim of this study was to (1) determine if CPAP requirements are higher for oronasal masks compared to nasal mask interfaces and (2) assess whether polysomnography and patient characteristics differed among mask preference groups. Retrospective analysis of all CPAP implementation polysomnograms between July 2013 and June 2014. Prescribed CPAP level, polysomnography results and patient data were compared according to mask type (n = 358). Oronasal masks were used in 46%, nasal masks in 35% and nasal pillow masks in 19%. There was no difference according to mask type for baseline apnea-hypopnea index (AHI), body mass index (BMI), waist or neck circumference. CPAP level was higher for oronasal masks, 12 (10-15.5) cm H2O compared to nasal pillow masks, 11 (8-12.5) cm H2O and nasal masks, 10 (8-12) cm H2O, p < 0.0001 (Median [interquartile range]). Oronasal mask type, AHI, age, and BMI were independent predictors of a higher CPAP pressure (p < 0.0005, adjusted R(2) = 0.26.). For patients with CPAP ≥ 15 cm H2O, there was an odds ratio of 4.5 (95% CI 2.5-8.0) for having an oronasal compared to a nasal or nasal pillow mask. Residual median AHI was higher for oronasal masks (11.3 events/h) than for nasal masks (6.4 events/h) and nasal pillows (6.7 events/h), p < 0.001. Compared to nasal mask types, oronasal masks are associated with higher CPAP pressures (particularly pressures ≥ 15 cm H2O) and a higher residual AHI. Further evaluation with a randomized control trial is required to definitively establish the effect of mask type on pressure requirements. A commentary on this article appears in this issue on page 1209. © 2016 American Academy of Sleep Medicine.

Evaluation of setup uncertainties for single-fraction SRS by comparing two different mask-creation methods

NASA Astrophysics Data System (ADS)

Baek, Jong Geun; Jang, Hyun Soo; Oh, Young Kee; Lee, Hyun Jeong; Kim, Eng Chan

2015-07-01

The purpose of this study was to evaluate the setup uncertainties for single-fraction stereotactic radiosurgery (SF-SRS) based on clinical data with two different mask-creation methods using pretreatment con-beam computed tomography imaging guidance. Dedicated frameless fixation Brain- LAB masks for 23 patients were created as a routine mask (R-mask) making method, as explained in the BrainLAB's user manual. Alternative masks (A-masks), which were created by modifying the cover range of the R-masks for the patient's head, were used for 23 patients. The systematic errors including these for each mask and stereotactic target localizer were analyzed, and the errors were calculated as the means ± standard deviations (SD) from the left-right (LR), superior-inferior (SI), anterior-posterior (AP), and yaw setup corrections. In addition, the frequencies of the threedimensional (3D) vector length were analyzed. The values of the mean setup corrections for the R-mask in all directions were < 0.7 mm and < 0.1°, whereas the magnitudes of the SDs were relatively large compared to the mean values. In contrast, the means and SDs of the A-mask were smaller than those for the R-mask with the exception of the SD in the AP direction. The means and SDs in the yaw rotational direction for the R-mask and the A-mask system were comparable. 3D vector shifts of larger magnitude occurred more frequently for the R-mask than the A-mask. The setup uncertainties for each mask with the stereotactic localizing system had an asymmetric offset towards the positive AP direction. The A-mask-creation method, which is capable of covering the top of the patient's head, is superior to that for the R-mask, so the use of the A-mask is encouraged for SF-SRS to reduce the setup uncertainties. Moreover, careful mask-making is required to prevent possible setup uncertainties.

Absorbing boundaries in numerical solutions of the time-dependent Schroedinger equation on a grid using exterior complex scaling

DOE Office of Scientific and Technical Information (OSTI.GOV)

He, F.; Ruiz, C.; Becker, A.

We study the suppression of reflections in the numerical simulation of the time-dependent Schroedinger equation for strong-field problems on a grid using exterior complex scaling (ECS) as an absorbing boundary condition. It is shown that the ECS method can be applied in both the length and the velocity gauge as long as appropriate approximations are applied in the ECS transformation of the electron-field coupling. It is found that the ECS method improves the suppression of reflection as compared to the conventional masking function technique in typical simulations of atoms exposed to an intense laser pulse. Finally, we demonstrate the advantagemore » of the ECS technique to avoid unphysical artifacts in the evaluation of high harmonic spectra.« less

Modified polarized geometrical attenuation model for bidirectional reflection distribution function based on random surface microfacet theory.

PubMed

Liu, Hong; Zhu, Jingping; Wang, Kai

2015-08-24

The geometrical attenuation model given by Blinn was widely used in the geometrical optics bidirectional reflectance distribution function (BRDF) models. Blinn's geometrical attenuation model based on symmetrical V-groove assumption and ray scalar theory causes obvious inaccuracies in BRDF curves and negatives the effects of polarization. Aiming at these questions, a modified polarized geometrical attenuation model based on random surface microfacet theory is presented by combining of masking and shadowing effects and polarized effect. The p-polarized, s-polarized and unpolarized geometrical attenuation functions are given in their separate expressions and are validated with experimental data of two samples. It shows that the modified polarized geometrical attenuation function reaches better physical rationality, improves the precision of BRDF model, and widens the applications for different polarization.

Pressure Ulcer Incidence in Patients Wearing Nasal-Oral Versus Full-Face Noninvasive Ventilation Masks.

PubMed

Schallom, Marilyn; Cracchiolo, Lisa; Falker, Antoinette; Foster, Jennifer; Hager, JoAnn; Morehouse, Tamara; Watts, Peggy; Weems, Linda; Kollef, Marin

2015-07-01

Device-related pressure ulcers from noninvasive ventilation masks alter skin integrity and cause patients discomfort. To examine the incidence, location, and stage of pressure ulcers and patients' comfort with a nasal-oral mask compared with a full-face mask. A before-after study of a convenience sample of patients with noninvasive ventilation orders in 5 intensive care units was conducted. Two groups of 100 patients each received either the nasal-oral mask or the full-face mask. Skin was assessed before the mask was applied and every 12 hours after that or upon mask removal. Comfort levels were assessed every 12 hours on a Likert scale of 1 to 5 (1, most comfortable). A pressure ulcer developed in 20% of patients in the nasal-oral mask group and 2% of patients in the full-face mask group (P < .001). Comfort scores were significantly lower (more comfortable) with the full-face mask (mean [SD], 1.9 [1.1]) than with the nasal-oral mask (mean [SD], 2.7 [1.2], P < .001). Neither mean hours worn nor percentage adherence differed significantly: 28.9 (SD, 27.2) hours and 92% for full-face mask and 25 (SD, 20.7) and 92% for nasal-oral mask. No patients who had a pressure ulcer develop with the nasal-oral mask had a pressure ulcer develop with the full-face mask. The full-face mask resulted in significantly fewer pressure ulcers and was more comfortable for patients. The full-face mask is a reasonable alternative to traditional nasal-oral masks for patients receiving noninvasive ventilation. ©2015 American Association of Critical-Care Nurses.

Refining Techniques for the Spectroscopic Detection of Reflected Light from Exoplanets

NASA Astrophysics Data System (ADS)

Roy, Arpita; Bender, Chad; Mahadevan, Suvrath

2015-12-01

The detection of reflected light from exoplanets provides a direct measure of planetary mass as well as a powerful probe of atmospheric composition and albedo. However, close-in giant planets which provide the largest planet-to-star flux ratios are dim in the optical. With contrasts at the level of 10^-5, the direct detection of these present a severe technical challenge to current instruments, and require both large aperture telescopes for high signal-to-noise ratio observations, and a stabilized spectrograph for stable instrument profiles. Leveraging the heritage and stability of the HARPS spectrograph, Martins et al (2015) recently published evidence of a direct detection of the historic exoplanet 51 Peg b, using the stellar mask cross-correlation technique. We attempt to expand upon their results with independent spectral and CCF reductions, using a two-template cross-correlation technique that can potentially be tuned to match the planetary signal and probe models of the albedo. By cross-correlating against a spectrum rather than a mask, we access the full information content in the lines, but must ensure proper telluric correction to mitigate the possibility of overwhelming the small planetary signal with terrestrial features. We are on the verge of confidently recovering planetary albedos for close-in giant planets, while also refining predictive and analytical tools that will come into their full capability with the arrival of the next generation of planet characterizing instruments, such as ESPRESSO on VLT and HIRES on E-ELT.

Spectral narrowing of a 980 nm tapered diode laser bar

NASA Astrophysics Data System (ADS)

Vijayakumar, Deepak; Jensen, Ole Bjarlin; Lucas Leclin, Ga"lle; Petersen, Paul Michael; Thestrup, Birgitte

2011-03-01

High power diode laser bars are interesting in many applications such as solid state laser pumping, material processing, laser trapping, laser cooling and second harmonic generation. Often, the free running laser bars emit a broad spectrum of the order of several nanometres which limit their scope in wavelength specific applications and hence, it is vital to stabilize the emission spectrum of these devices. In our experiment, we describe the wavelength narrowing of a 12 element 980 nm tapered diode laser bar using a simple Littman configuration. The tapered laser bar which suffered from a big smile has been "smile corrected" using individual phase masks for each emitter. The external cavity consists of the laser bar, both fast and slow axis micro collimators, smile correcting phase mask, 6.5x beam expanding lens combination, a 1200 lines/mm reflecting grating with 85% efficiency in the first order, a slow axis focusing cylindrical lens of 40 mm focal length and an output coupler which is 10% reflective. In the free running mode, the laser emission spectrum was 5.5 nm wide at an operating current of 30A. The output power was measured to be in excess of 12W. Under the external cavity operation, the wavelength spread of the laser could be limited to 0.04 nm with an output power in excess of 8 W at an operating current of 30A. The spectrum was found to be tuneable in a range of 16 nm.

Design Architecture of field-effect transistor with back gate electrode for biosensor application

NASA Astrophysics Data System (ADS)

Fathil, M. F. M.; Arshad, M. K. Md.; Hashim, U.; Ruslinda, A. R.; Gopinath, Subash C. B.; M. Nuzaihan M., N.; Ayub, R. M.; Adzhri, R.; Zaki, M.; Azman, A. H.

2016-07-01

This paper presents the preparation method of photolithography chrome mask design used in fabrication process of field-effect transistor with back gate biasing based biosensor. Initially, the chrome masks are designed by studying the process flow of the biosensor fabrication, followed by drawing of the actual chrome mask using the AutoCAD software. The overall width and length of the device is optimized at 16 mm and 16 mm, respectively. Fabrication processes of the biosensor required five chrome masks, which included source and drain formation mask, the back gate area formation mask, electrode formation mask, front gate area formation mask, and passivation area formation mask. The complete chrome masks design will be sent for chrome mask fabrication and for future use in biosensor fabrication.

Improved Method of Manufacturing SiC Devices

NASA Technical Reports Server (NTRS)

Okojie, Robert S.

2005-01-01

The phrase, "common-layered architecture for semiconductor silicon carbide" ("CLASSiC") denotes a method of batch fabrication of microelectromechanical and semiconductor devices from bulk silicon carbide. CLASSiC is the latest in a series of related methods developed in recent years in continuing efforts to standardize SiC-fabrication processes. CLASSiC encompasses both institutional and technological innovations that can be exploited separately or in combination to make the manufacture of SiC devices more economical. Examples of such devices are piezoresistive pressure sensors, strain gauges, vibration sensors, and turbulence-intensity sensors for use in harsh environments (e.g., high-temperature, high-pressure, corrosive atmospheres). The institutional innovation is to manufacture devices for different customers (individuals, companies, and/or other entities) simultaneously in the same batch. This innovation is based on utilization of the capability for fabrication, on the same substrate, of multiple SiC devices having different functionalities (see figure). Multiple customers can purchase shares of the area on the same substrate, each customer s share being apportioned according to the customer s production-volume requirement. This makes it possible for multiple customers to share costs in a common foundry, so that the capital equipment cost per customer in the inherently low-volume SiC-product market can be reduced significantly. One of the technological innovations is a five-mask process that is based on an established set of process design rules. The rules provide for standardization of the fabrication process, yet are flexible enough to enable multiple customers to lay out masks for their portions of the SiC substrate to provide for simultaneous batch fabrication of their various devices. In a related prior method, denoted multi-user fabrication in silicon carbide (MUSiC), the fabrication process is based largely on surface micromachining of poly SiC. However, in MUSiC one cannot exploit the superior sensing, thermomechanical, and electrical properties of single-crystal 6H-SiC or 4H-SiC. As a complement to MUSiC, the CLASSiC five-mask process can be utilized to fabricate multiple devices in bulk single-crystal SiC of any polytype. The five-mask process makes fabrication less complex because it eliminates the need for large-area deposition and removal of sacrificial material. Other innovations in CLASSiC pertain to selective etching of indium tin oxide and aluminum in connection with multilayer metallization. One major characteristic of bulk micromachined microelectromechanical devices is the presence of three-dimensional (3D) structures. Any 3D recesses that already exist at a given step in a fabrication process usually make it difficult to apply a planar coat of photoresist for metallization and other subsequent process steps. To overcome this difficulty, the CLASSiC process includes a reversal of part of the conventional flow: Metallization is performed before the recesses are etched.

X-ray mask fabrication advancements at the Microlithographic Mask Development Center

NASA Astrophysics Data System (ADS)

Kimmel, Kurt R.; Hughes, Patrick J.

1996-05-01

The Microlithographic Mask Development Center (MMD) was established as the X-ray mask manufacturing facility at the IBM Microelectronics Division semiconductor fabricator in Essex Junction, Vermont. This center, in operation for over two years, produces high yielding, defect-free X-ray masks for competitive logic and memory products at 250nm groundrules and below. The MMD is a complete mask facility that manufactures silicon membrane mask blanks in the NIST format and finished masks with electroplated gold X-ray absorber. Mask patterning, with dimensions as small as 180 nm, is accomplished using IBM-built variable shaped spot e-beam systems. Masks are routinely inspected and repaired using state-of-the-art equipment: two KLA SEM Specs for defect inspection, a Leica LMS 2000 for image placement characterization, an Amray 2040c for image dimension characterization and a Micrion 8000 XMR for defect repair. This facility maintains a baseline mask process with daily production of 250nm, 32Mb SRAM line monitor masks for the continuous improvement of mask quality and processes. Development masks are produced for several semiconductor manufacturers including IBM, Motorola, Loral, and Sanders. Masks for 64Mb and 256Mb DRAM (IBM) and advanced logic/SRAM (IBM and Motorola) designs have also been delivered. This paper describes the MMD facility and its technical capabilities. Key manufacturing metrics such as mask turnaround time, parametric yield learning and defect reduction activities are highlighted. The challenges associated with improved mask quality, sub-180nm mask fabrication, and the transition to refractory metal absorber are discussed.

Flavored Anesthetic Masks for Inhalational Induction in Children.

PubMed

Gupta, Aakriti; Mathew, Preethy Joseph; Bhardwaj, Neerja

2017-10-01

To evaluate the clinical efficacy of masking the odor of inhalational agents using fruit flavors on the anxiety behavior and compliance of children for inhalational induction. A prospective randomized double blind, placebo controlled study was conducted on 60 unpremedicated children in the age group of 4-12 y. Thirty children received anesthetic masks smeared with a flavor of child's choice while the other 30 children were induced using masks without flavor. Anxiety was assessed using modified Yale Pre-operative Anxiety Scale (mYPAS) in the pre-op room and during inhalational induction. Mask acceptance was graded by Induction Compliance Checklist (ICC). The cost-effectiveness of flavored anesthetic masks was compared to that of commercially available pre-scented masks. The baseline anxiety in the two groups was comparable. The number of children demonstrating high levels of anxiety at anesthetic induction was similar in flavored and non-flavored mask groups (p 0.45). The compliance to mask induction was also equally good (p 0.99). The authors found significant difference in the cost of flavored mask (INR 56.45 per mask) as compared to commercially available pre-scented masks (INR 660 per mask). The authors observed a placebo effect that reduced the pre-op anxiety in the control group which probably made the quality of induction equivalent with flavored and non-flavored masks. Therefore, using a flavored anesthetic mask is cost-effective than using a commercially available pre-scented mask.

Comparison of Ventilation With One-Handed Mask Seal With an Intraoral Mask Versus Conventional Cuffed Face Mask in a Cadaver Model: A Randomized Crossover Trial.

PubMed

Amack, Andrew J; Barber, Gary A; Ng, Patrick C; Smith, Thomas B; April, Michael D

2017-01-01

We compare received minute volume with an intraoral mask versus conventional cuffed face mask among medics obtaining a 1-handed mask seal on a cadaver model. This study comprised a randomized crossover trial of adult US Army combat medic volunteers participating in a cadaver laboratory as part of their training. We randomized participants to obtain a 1-handed mask seal during ventilation of a fresh unembalmed cadaver, first using either an intraoral airway device or conventional cuffed face mask. Participants obtained a 1-handed mask seal while a ventilator delivered 10 standardized 750-mL breaths during 1 minute. After a 5-minute rest period, they repeated the study with the alternative mask. The primary outcome measure was received minute volume as measured by a respirometer. Of 27 recruited participants, all completed the study. Median received minute volume was higher with the intraoral mask compared with conventional cuffed mask by 1.7 L (95% confidence interval 1.0 to 1.9 L; P<.001). The intraoral mask resulted in greater received minute volume received compared with conventional cuffed face mask during ventilation with a 1-handed mask seal in a cadaver model. The intraoral mask may prove a useful airway adjunct for ventilation. Copyright © 2016 American College of Emergency Physicians. Published by Elsevier Inc. All rights reserved.

Attenuation of harmonic noise in vibroseis data using Simulated Annealing

NASA Astrophysics Data System (ADS)

Sharma, S. P.; Tildy, Peter; Iranpour, Kambiz; Scholtz, Peter

2009-04-01

Processing of high productivity vibroseis seismic data (such as slip-sweep acquisition records) suffers from the well known disadvantage of harmonic distortion. Harmonic distortions are observed after cross-correlation of the recorded seismic signal with the pilot sweep and affect the signals in negative time (before the actual strong reflection event). Weak reflection events of the earlier sweeps falling in the negative time window of the cross-correlation sequence are being masked by harmonic distortions. Though the amplitude of the harmonic distortion is small (up to 10-20 %) compared to the fundamental amplitude of the reflection events, but it is significant enough to mask weak reflected signals. Elimination of harmonic noise due to source signal distortion from the cross-correlated seismic trace is a challenging task since the application of vibratory sources started and it still needs improvement. An approach has been worked out that minimizes the level of harmonic distortion by designing the signal similar to the harmonic distortion. An arbitrary length filter is optimized using the Simulated Annealing global optimization approach to design a harmonic signal. The approach deals with the convolution of a ratio trace (ratio of the harmonics with respect to the fundamental sweep) with the correlated "positive time" recorded signal and an arbitrary filter. Synthetic data study has revealed that this procedure of designing a signal similar to the desired harmonics using convolution of a suitable filter with theoretical ratio of harmonics with fundamental sweep helps in reducing the problem of harmonic distortion. Once we generate a similar signal for a vibroseis source using an optimized filter, then, this filter could be used to generate harmonics, which can be subtracted from the main cross-correlated trace to get the better, undistorted image of the subsurface. Designing the predicted harmonics to reduce the energy in the trace by considering weak reflection and observed harmonics together yields the desired result (resolution of weak reflected signal from the harmonic distortion). As optimization steps proceeds forward it is possible to observe from the difference plots of desired and predicted harmonics how weak reflections evolved from the harmonic distortion gradually during later iterations of global optimization. The procedure is applied in resolving weak reflections from a number of traces considered together. For a more precise design of harmonics SA procedure needs longer computation time which is impractical to deal with voluminous seismic data. However, the objective of resolving weak reflection signal in the strong harmonic noise can be achieved with fast computation using faster cooling schedule and less number of iterations and number of moves in simulated annealing procedure. This process could help in reducing the harmonics distortion and achieving the objective of resolving the lost weak reflection events in the cross-correlated seismic traces. Acknowledgements: The research was supported under the European Marie Curie Host Fellowships for Transfer of Knowledge (TOK) Development Host Scheme (contract no. MTKD-CT-2006-042537).

Developing Multilingual Pedagogies and Research through Language Study and Reflection

ERIC Educational Resources Information Center

Catalano, Theresa; Shende, Madhur; Suh, Emily K.

2018-01-01

Globalisation and increased transnational migration underscore the need for educational responses to multilingualism and multilingual discourses. One way to heighten awareness of multilingual pedagogies (while simultaneously providing data for multilingual research) is the use of reflective language study and journaling by language…

A face versus non-face context influences amygdala responses to masked fearful eye whites.

PubMed

Kim, M Justin; Solomon, Kimberly M; Neta, Maital; Davis, F Caroline; Oler, Jonathan A; Mazzulla, Emily C; Whalen, Paul J

2016-12-01

The structure of the mask stimulus is crucial in backward masking studies and we recently demonstrated such an effect when masking faces. Specifically, we showed that activity of the amygdala is increased to fearful facial expressions masked with neutral faces and decreased to fearful expressions masked with a pattern mask-but critically both masked conditions discriminated fearful expressions from happy expressions. Given this finding, we sought to test whether masked fearful eye whites would produce a similar profile of amygdala response in a face vs non-face context. During functional magnetic resonance imaging scanning sessions, 30 participants viewed fearful or happy eye whites masked with either neutral faces or pattern images. Results indicated amygdala activity was increased to fearful vs happy eye whites in the face mask condition, but decreased to fearful vs happy eye whites in the pattern mask condition-effectively replicating and expanding our previous report. Our data support the idea that the amygdala is responsive to fearful eye whites, but that the nature of this activity observed in a backward masking design depends on the mask stimulus. © The Author (2016). Published by Oxford University Press.

Origin of the anomalous decrease in the apparent density of polymer gels observed by multi-echo reflection ultrasound spectroscopy.

PubMed

Takeda, Kohsuke; Norisuye, Tomohisa; Tran-Cong-Miyata, Qui

2013-07-01

Multi-echo reflection ultrasound spectroscopy (MERUS), which enables one to simultaneously evaluate the attenuation coefficient α, the sound velocity v and the density ρ, has been developed for measurements of elastic moduli. In the present study, the technique was further developed to analyze systems undergoing gelation where an unphysical decrease in the apparent density was previously observed after polymerization. The main reason for this problem was that the shrinkage accompanying the gelation led to a small gap between the cell wall and the sample, resulting in the superposition of the reflected signals which were not separable into individual components. By taking into account the multiply reflecting echoes at the interface of the gap, the corrected densities were systematically obtained and compared with the results for the floating test. The present technique opens a new route to simultaneously evaluate the three parameters α, v and ρ and also the sample thickness for solid thin films. Copyright © 2013 Elsevier B.V. All rights reserved.

Masking with faces in central visual field under a variety of temporal schedules.

PubMed

Daar, Marwan; Wilson, Hugh R

2015-11-01

With a few exceptions, previous studies have explored masking using either a backward mask or a common onset trailing mask, but not both. In a series of experiments, we demonstrate the use of faces in central visual field as a viable method to study the relationship between these two types of mask schedule. We tested observers in a two alternative forced choice face identification task, where both target and mask comprised synthetic faces, and show that a simple model can successfully predict masking across a variety of masking schedules ranging from a backward mask to a common onset trailing mask and a number of intermediate variations. Our data are well accounted for by a window of sensitivity to mask interference that is centered at around 100 ms. Copyright © 2015 Elsevier Ltd. All rights reserved.

Wafer hot spot identification through advanced photomask characterization techniques: part 2

NASA Astrophysics Data System (ADS)

Choi, Yohan; Green, Michael; Cho, Young; Ham, Young; Lin, Howard; Lan, Andy; Yang, Richer; Lung, Mike

2017-03-01

Historically, 1D metrics such as Mean to Target (MTT) and CD Uniformity (CDU) have been adequate for mask end users to evaluate and predict the mask impact on the wafer process. However, the wafer lithographer's process margin is shrinking at advanced nodes to a point that classical mask CD metrics are no longer adequate to gauge the mask contribution to wafer process error. For example, wafer CDU error at advanced nodes is impacted by mask factors such as 3-dimensional (3D) effects and mask pattern fidelity on sub-resolution assist features (SRAFs) used in Optical Proximity Correction (OPC) models of ever-increasing complexity. To overcome the limitation of 1D metrics, there are numerous on-going industry efforts to better define wafer-predictive metrics through both standard mask metrology and aerial CD methods. Even with these improvements, the industry continues to struggle to define useful correlative metrics that link the mask to final device performance. In part 1 of this work, we utilized advanced mask pattern characterization techniques to extract potential hot spots on the mask and link them, theoretically, to issues with final wafer performance. In this paper, part 2, we complete the work by verifying these techniques at wafer level. The test vehicle (TV) that was used for hot spot detection on the mask in part 1 will be used to expose wafers. The results will be used to verify the mask-level predictions. Finally, wafer performance with predicted and verified mask/wafer condition will be shown as the result of advanced mask characterization. The goal is to maximize mask end user yield through mask-wafer technology harmonization. This harmonization will provide the necessary feedback to determine optimum design, mask specifications, and mask-making conditions for optimal wafer process margin.

Evaluation of a new pediatric positive airway pressure mask.

PubMed

Kushida, Clete A; Halbower, Ann C; Kryger, Meir H; Pelayo, Rafael; Assalone, Valerie; Cardell, Chia-Yu; Huston, Stephanie; Willes, Leslee; Wimms, Alison J; Mendoza, June

2014-09-15

The choice and variety of pediatric masks for continuous positive airway pressure (CPAP) is limited in the US. Therefore, clinicians often prescribe modified adult masks. Until recently a mask for children aged < 7 years was not available. This study evaluated apnea-hypopnea index (AHI) equivalence and acceptability of a new pediatric CPAP mask for children aged 2-7 years (Pixi; ResMed Ltd, Sydney, Australia). Patients aged 2-7 years were enrolled and underwent in-lab baseline polysomnography (PSG) using their previous mask, then used their previous mask and the VPAP III ST-A flow generator for ≥ 10 nights at home. Thereafter, patients switched to the Pixi mask for ≥ 2 nights before returning for a PSG during PAP therapy via the Pixi mask. Patients then used the Pixi mask at home for ≥ 21 nights. Patients and their parents/guardians returned to the clinic for follow-up and provided feedback on the Pixi mask versus their previous mask. AHI with the Pixi mask was 1.1 ± 1.5/h vs 2.6 ± 5.4/h with the previous mask (p = 0.3538). Parents rated the Pixi mask positively for: restfulness of the child's sleep, trouble in getting the child to sleep, and trouble in having the child stay asleep. The Pixi mask was also rated highly for leaving fewer or no marks on the upper lip and under the child's ears, and being easy to remove. The Pixi mask is suitable for children aged 2-7 years and provides an alternative to other masks available for PAP therapy in this age group. © 2014 American Academy of Sleep Medicine.

Adaptation to different noninvasive ventilation masks in critically ill patients*

PubMed Central

da Silva, Renata Matos; Timenetsky, Karina Tavares; Neves, Renata Cristina Miranda; Shigemichi, Liane Hirano; Kanda, Sandra Sayuri; Maekawa, Carla; Silva, Eliezer; Eid, Raquel Afonso Caserta

2013-01-01

OBJECTIVE: To identify which noninvasive ventilation (NIV) masks are most commonly used and the problems related to the adaptation to such masks in critically ill patients admitted to a hospital in the city of São Paulo, Brazil. METHODS: An observational study involving patients ≥ 18 years of age admitted to intensive care units and submitted to NIV. The reason for NIV use, type of mask, NIV regimen, adaptation to the mask, and reasons for non-adaptation to the mask were investigated. RESULTS: We evaluated 245 patients, with a median age of 82 years. Acute respiratory failure was the most common reason for NIV use (in 71.3%). Total face masks were the most commonly used (in 74.7%), followed by full face masks and near-total face masks (in 24.5% and 0.8%, respectively). Intermittent NIV was used in 82.4% of the patients. Adequate adaptation to the mask was found in 76% of the patients. Masks had to be replaced by another type of mask in 24% of the patients. Adequate adaptation to total face masks and full face masks was found in 75.5% and 80.0% of the patients, respectively. Non-adaptation occurred in the 2 patients using near-total facial masks. The most common reason for non-adaptation was the shape of the face, in 30.5% of the patients. CONCLUSIONS: In our sample, acute respiratory failure was the most common reason for NIV use, and total face masks were the most commonly used. The most common reason for non-adaptation to the mask was the shape of the face, which was resolved by changing the type of mask employed. PMID:24068269

Adaptation to different noninvasive ventilation masks in critically ill patients.

PubMed

Silva, Renata Matos da; Timenetsky, Karina Tavares; Neves, Renata Cristina Miranda; Shigemichi, Liane Hirano; Kanda, Sandra Sayuri; Maekawa, Carla; Silva, Eliezer; Eid, Raquel Afonso Caserta

2013-01-01

To identify which noninvasive ventilation (NIV) masks are most commonly used and the problems related to the adaptation to such masks in critically ill patients admitted to a hospital in the city of São Paulo, Brazil. An observational study involving patients ≥ 18 years of age admitted to intensive care units and submitted to NIV. The reason for NIV use, type of mask, NIV regimen, adaptation to the mask, and reasons for non-adaptation to the mask were investigated. We evaluated 245 patients, with a median age of 82 years. Acute respiratory failure was the most common reason for NIV use (in 71.3%). Total face masks were the most commonly used (in 74.7%), followed by full face masks and near-total face masks (in 24.5% and 0.8%, respectively). Intermittent NIV was used in 82.4% of the patients. Adequate adaptation to the mask was found in 76% of the patients. Masks had to be replaced by another type of mask in 24% of the patients. Adequate adaptation to total face masks and full face masks was found in 75.5% and 80.0% of the patients, respectively. Non-adaptation occurred in the 2 patients using near-total facial masks. The most common reason for non-adaptation was the shape of the face, in 30.5% of the patients. In our sample, acute respiratory failure was the most common reason for NIV use, and total face masks were the most commonly used. The most common reason for non-adaptation to the mask was the shape of the face, which was resolved by changing the type of mask employed.

Oronasal Masks Require a Higher Pressure than Nasal and Nasal Pillow Masks for the Treatment of Obstructive Sleep Apnea

PubMed Central

Deshpande, Sheetal; Joosten, Simon; Turton, Anthony; Edwards, Bradley A.; Landry, Shane; Mansfield, Darren R.; Hamilton, Garun S.

2016-01-01

Study Objectives: Oronasal masks are frequently used for continuous positive airway pressure (CPAP) treatment in patients with obstructive sleep apnea (OSA). The aim of this study was to (1) determine if CPAP requirements are higher for oronasal masks compared to nasal mask interfaces and (2) assess whether polysomnography and patient characteristics differed among mask preference groups. Methods: Retrospective analysis of all CPAP implementation polysomnograms between July 2013 and June 2014. Prescribed CPAP level, polysomnography results and patient data were compared according to mask type (n = 358). Results: Oronasal masks were used in 46%, nasal masks in 35% and nasal pillow masks in 19%. There was no difference according to mask type for baseline apnea-hypopnea index (AHI), body mass index (BMI), waist or neck circumference. CPAP level was higher for oronasal masks, 12 (10–15.5) cm H2O compared to nasal pillow masks, 11 (8–12.5) cm H2O and nasal masks, 10 (8–12) cm H2O, p < 0.0001 (Median [interquartile range]). Oronasal mask type, AHI, age, and BMI were independent predictors of a higher CPAP pressure (p < 0.0005, adjusted R2 = 0.26.). For patients with CPAP ≥ 15 cm H2O, there was an odds ratio of 4.5 (95% CI 2.5–8.0) for having an oronasal compared to a nasal or nasal pillow mask. Residual median AHI was higher for oronasal masks (11.3 events/h) than for nasal masks (6.4 events/h) and nasal pillows (6.7 events/h), p < 0.001. Conclusions: Compared to nasal mask types, oronasal masks are associated with higher CPAP pressures (particularly pressures ≥ 15 cm H2O) and a higher residual AHI. Further evaluation with a randomized control trial is required to definitively establish the effect of mask type on pressure requirements. Commentary: A commentary on this article appears in this issue on page 1209. Citation: Deshpande S, Joosten S, Turton A, Edwards BA, Landry S, Mansfield DR, Hamilton GS. Oronasal masks require a higher pressure than nasal and nasal pillow masks for the treatment of obstructive sleep apnea. J Clin Sleep Med 2016;12(9):1263–1268. PMID:27448430

DOE Office of Scientific and Technical Information (OSTI.GOV)

Webb, Aaron P.; Carlson, Charles T.; Honan, Michael

A plurality of masks is attached to the underside of a mask frame. This attachment is made such that each mask can independently move relative to the mask frame in three directions. This relative movement allows each mask to adjust its position to align with respective alignment pins disposed on a working surface. In one embodiment, each mask is attached to the mask frame using fasteners, where the fasteners have a shaft with a diameter smaller than the diameter of the mounting hole disposed on the mask. A bias element may be used to allow relative movement between the maskmore » and the mask frame in the vertical direction. Each mask may also have kinematic features to mate with the respective alignment pins on the working surface.« less

Statistical Studies on Thin Cirrus from MODIS Data

NASA Technical Reports Server (NTRS)

Li, Rong-Rong; Kaufman, Yoram; Remer, Lorraine

2004-01-01

The 1.38 micron channel on the MODerate resolution Imaging Spectroradiomater (MODIS) is an ideal channel to identify and quantify thin cirrus on a global basis. This channel is used to produce the cirrus reflectance product in MOD06 and also used extensively by the MODIS aerosol algorithms to mask clouds for the MOD04 product. The aerosol product uses a lower threshold of the 1.38 micron channel reflectance of 0.01. A cirrus channel reflectance of 0.01 corresponds to approximately an aerosol optical thickness of 0.10. Therefore, the ambiguity due to the minor cirrus contamination may introduce artificial optical thickness in the aerosol products. The questions arise: How prevalent are the thinnest cirrus clouds over the globe? Do they persist over specific regions and seasons? Can we distinguish between the noise of the channel and the actual cloudiness by extrapolating the cloudiness signal to very dark scenes, statistically. We analyze the Terra data, over land and ocean to answer these questions.

Direct comparison of the performance of commonly used e-beam resists during nano-scale plasma etching of Si, SiO2, and Cr

NASA Astrophysics Data System (ADS)

Goodyear, Andy; Boettcher, Monika; Stolberg, Ines; Cooke, Mike

2015-03-01

Electron beam writing remains one of the reference pattern generation techniques, and plasma etching continues to underpin pattern transfer. We report a systematic study of the plasma etch resistance of several e-beam resists, both negative and positive as well as classical and Chemically Amplified Resists: HSQ[1,2] (Dow Corning), PMMA[3] (Allresist GmbH), AR-P6200 (Allresist GmbH), ZEP520 (Zeon Corporation), CAN028 (TOK), CAP164 (TOK), and an additional pCAR (non-disclosed provider). Their behaviour under plasma exposure to various nano-scale plasma etch chemistries was examined (SF6/C4F8 ICP silicon etch, CHF3/Ar RIE SiO2 etch, Cl2/O2 RIE and ICP chrome etch, and HBr ICP silicon etch). Samples of each resist type were etched simultaneously to provide a direct comparison of their etch resistance. Resist thicknesses (and hence resist erosion rates) were measured by spectroscopic ellipsometer in order to provide the highest accuracy for the resist comparison. Etch selectivities (substrate:mask etch rate ratio) are given, with recommendations for the optimum resist choice for each type of etch chemistry. Silicon etch profiles are also presented, along with the exposure and etch conditions to obtain the most vertical nano-scale pattern transfer. We identify one resist that gave an unusually high selectivity for chlorinated and brominated etches which could enable pattern transfer below 10nm without an additional hard mask. In this case the resist itself acts as a hard mask. We also highlight the differing effects of fluorine and bromine-based Silicon etch chemistries on resist profile evolution and hence etch fidelity.

Simultaneous detection of multiple chemical residues in milk using broad-specifity antibodies in a hybrid immunosorbent assay

USDA-ARS?s Scientific Manuscript database

The wide array of applications using quantum dots (QDs) for detection of multiple analytes reflects the versatility of the technology. In this study, a novel immunoassay using 2 types of sensors (QDs and an enzyme) were simultaneously used for detecting multiple structurally different low-molecular...

Leadership Qualities Found in Administrators Performing Simultaneous Duties Identified by Teacher Experiences

ERIC Educational Resources Information Center

Berry, Bennie S.

2014-01-01

The purpose of this basic qualitative research study was to explore the experiences of teachers in small rural school districts with an administrator that served as superintendent and principal simultaneously and reflect on what they identified as leadership qualities and characteristics. The participants were all teachers who worked in School…

Evaluation of a New Pediatric Positive Airway Pressure Mask

PubMed Central

Kushida, Clete A.; Halbower, Ann C.; Kryger, Meir H.; Pelayo, Rafael; Assalone, Valerie; Cardell, Chia-Yu; Huston, Stephanie; Willes, Leslee; Wimms, Alison J.; Mendoza, June

2014-01-01

Study Objectives: The choice and variety of pediatric masks for continuous positive airway pressure (CPAP) is limited in the US. Therefore, clinicians often prescribe modified adult masks. Until recently a mask for children aged < 7 years was not available. This study evaluated apnea-hypopnea index (AHI) equivalence and acceptability of a new pediatric CPAP mask for children aged 2-7 years (Pixi; ResMed Ltd, Sydney, Australia). Methods: Patients aged 2-7 years were enrolled and underwent in-lab baseline polysomnography (PSG) using their previous mask, then used their previous mask and the VPAP III ST-A flow generator for ≥ 10 nights at home. Thereafter, patients switched to the Pixi mask for ≥ 2 nights before returning for a PSG during PAP therapy via the Pixi mask. Patients then used the Pixi mask at home for ≥ 21 nights. Patients and their parents/guardians returned to the clinic for follow-up and provided feedback on the Pixi mask versus their previous mask. Results: AHI with the Pixi mask was 1.1 ± 1.5/h vs 2.6 ± 5.4/h with the previous mask (p = 0.3538). Parents rated the Pixi mask positively for: restfulness of the child's sleep, trouble in getting the child to sleep, and trouble in having the child stay asleep. The Pixi mask was also rated highly for leaving fewer or no marks on the upper lip and under the child's ears, and being easy to remove. Conclusions: The Pixi mask is suitable for children aged 2-7 years and provides an alternative to other masks available for PAP therapy in this age group. Citation: Kushida CA, Halbower AC, Kryger MH, Pelayo R, Assalone V, Cardell CY, Huston S, Willes L, Wimms AJ, Mendoza J. Evaluation of a new pediatric positive airway pressure mask. J Clin Sleep Med 2014;10(9):979-984. PMID:25142768

Combinatorial preparation and characterization of thin-film multilayer electro-optical devices.

PubMed

Neuber, Christian; Bäte, Markus; Thelakkat, Mukundan; Schmidt, Hans-Werner; Hänsel, Helmut; Zettl, Heiko; Krausch, Georg

2007-07-01

In this article we present a setup for the combinatorial vapor deposition of thin-film multilayer devices as well as methods for the fast and efficient analytic screening of the libraries obtained. The preparation setup is based on a commercially available evaporation chamber equipped with various evaporation sources for both organic and metallic materials. The combinatorial approach is realized by the combination of a rotation stage for the substrate, a five-mask sampler, and an additional mask whose position can be deliberately varied along one axis during the evaporation process. The latter is used to evaporate linear as well as step gradients by continuous or stepwise movement of a shutter mask. The mask sampler allows to define the sectors of the library and to evaporate more complex structures, e.g., an electrode layout. Finally, the simultaneous evaporation of two or more materials enables us to produce layers of varying composition ratio in general and doped materials, in particular. For the control of the evaporation process we have developed an automation software, which is particularly helpful for complex library designs and which grants excellent repeatability of experiments. Efficient and fast characterization of the obtained libraries is realized by (i) a purely optical setup and (ii) an electro-optical setup. (i) The UV/vis reader FLASHScan 530 permits to map out the UV/vis absorbance or fluorescence of the whole library. The UV/vis absorbance is primarily used to determine layer thicknesses and to confirm thickness uniformity across larger regions. The fluorescence measurements are used to determine the composition of layers containing fluorescent dyes. (ii) For a detailed short- and long-term electro-optical analysis we have developed an automated measurement system, which allows the characterization of 8x8 optoelectronic devices and to study their degradation behavior. Both solar cells and organic light-emitting diodes can be tested. Finally, we have developed a data analysis software to extract characteristic values from the huge amount of data and with this facilitate the finding of systematic dependencies.

A Harmonized Landsat-Sentinel-2 Surface Reflectance product: a resource for Agricultural Monitoring

NASA Astrophysics Data System (ADS)

Masek, J. G.; Claverie, M.; Ju, J.; Vermote, E.; Justice, C. O.

2015-12-01

The combination of Landsat and Sentinel-2 data offers a unique opportunity to observe globally the land every 2-3 days at medium (<30m) spatial resolution. The Harmonized Landsat-Sentinel-2 (HLS) project is a NASA initiative aiming to produce surface reflectance data from Landsat and Sentinel-2 missions and to deliver them to the community in a combined, seamless form. The HLS will be beneficial for global agricultural monitoring applications that require medium spatial resolution and weekly or more frequent observations. In particular, the provided opportunity to track crop phenology at the scale of individual fields will support detailed mapping of crop type and type-specific vegetation conditions. To create a compatible set of radiometric measurements, the HLS product relies on rigorous pre- and post-launch cross-calibration (Landsat-8 OLI and Sentinel-2 MSI) activities. The processing chain includes the following components: atmospheric correction, cloud/shadow masking, nadir BRDF-adjustment, spectral-adjustment, regridding, and temporal composite. The atmospheric correction and cloud masking is based on the OLI atmospheric correction developed at NASA-GSFC and has been adapted to the MSI data. The BRDF-adjustment is based on a disaggregation technique using MODIS-based BRDF coefficients. The technique has been evaluated using the multi-angular acquisition from the SPOT 4 and 5 (Take5) experiments. The spectral-adjustment relies on a linear regression that has been calibrated and evaluated using synthetic data and surface reflectance processed from a large number of hyperspectral EO-1 Hyperion scenes. Finally, significant effort is placed on product validation and evaluation. The delivered data set will include surface reflectance products at different levels: Using the native gridding, i.e. UTM, 30m for Landsat-8, and UTM, 10-20m for Sentinel-2 Using a common global gridding (Sinusoidal, 30m) Temporal composite (Sinusoidal, 30m, 5-day) During the first year of operation of Sentinel-2A, the HLS will be prototyped over a selection of 30 sites that includes some of the JECAM sites, Aeronet sites and Cal/Val sites. Then, the HLS spatial coverage will be increased as more Sentinel-2A data become available.

GOCI Yonsei aerosol retrieval version 2 products: an improved algorithm and error analysis with uncertainty estimation from 5-year validation over East Asia

NASA Astrophysics Data System (ADS)

Choi, Myungje; Kim, Jhoon; Lee, Jaehwa; Kim, Mijin; Park, Young-Je; Holben, Brent; Eck, Thomas F.; Li, Zhengqiang; Song, Chul H.

2018-01-01

The Geostationary Ocean Color Imager (GOCI) Yonsei aerosol retrieval (YAER) version 1 algorithm was developed to retrieve hourly aerosol optical depth at 550 nm (AOD) and other subsidiary aerosol optical properties over East Asia. The GOCI YAER AOD had accuracy comparable to ground-based and other satellite-based observations but still had errors because of uncertainties in surface reflectance and simple cloud masking. In addition, near-real-time (NRT) processing was not possible because a monthly database for each year encompassing the day of retrieval was required for the determination of surface reflectance. This study describes the improved GOCI YAER algorithm version 2 (V2) for NRT processing with improved accuracy based on updates to the cloud-masking and surface-reflectance calculations using a multi-year Rayleigh-corrected reflectance and wind speed database, and inversion channels for surface conditions. The improved GOCI AOD τG is closer to that of the Moderate Resolution Imaging Spectroradiometer (MODIS) and Visible Infrared Imaging Radiometer Suite (VIIRS) AOD than was the case for AOD from the YAER V1 algorithm. The V2 τG has a lower median bias and higher ratio within the MODIS expected error range (0.60 for land and 0.71 for ocean) compared with V1 (0.49 for land and 0.62 for ocean) in a validation test against Aerosol Robotic Network (AERONET) AOD τA from 2011 to 2016. A validation using the Sun-Sky Radiometer Observation Network (SONET) over China shows similar results. The bias of error (τG - τA) is within -0.1 and 0.1, and it is a function of AERONET AOD and Ångström exponent (AE), scattering angle, normalized difference vegetation index (NDVI), cloud fraction and homogeneity of retrieved AOD, and observation time, month, and year. In addition, the diagnostic and prognostic expected error (PEE) of τG are estimated. The estimated PEE of GOCI V2 AOD is well correlated with the actual error over East Asia, and the GOCI V2 AOD over South Korea has a higher ratio within PEE than that over China and Japan.

Coded mask telescopes for X-ray astronomy

NASA Astrophysics Data System (ADS)

Skinner, G. K.; Ponman, T. J.

1987-04-01

The principle of the coded mask techniques are discussed together with the methods of image reconstruction. The coded mask telescopes built at the University of Birmingham, including the SL 1501 coded mask X-ray telescope flown on the Skylark rocket and the Coded Mask Imaging Spectrometer (COMIS) projected for the Soviet space station Mir, are described. A diagram of a coded mask telescope and some designs for coded masks are included.