Method for fabricating an ultra-low expansion mask blank having a crystalline silicon layer

DOEpatents

Cardinale, Gregory F.

2002-01-01

A method for fabricating masks for extreme ultraviolet lithography (EUVL) using Ultra-Low Expansion (ULE) substrates and crystalline silicon. ULE substrates are required for the necessary thermal management in EUVL mask blanks, and defect detection and classification have been obtained using crystalline silicon substrate materials. Thus, this method provides the advantages for both the ULE substrate and the crystalline silicon in an Extreme Ultra-Violet (EUV) mask blank. The method is carried out by bonding a crystalline silicon wafer or member to a ULE wafer or substrate and thinning the silicon to produce a 5-10 .mu.m thick crystalline silicon layer on the surface of the ULE substrate. The thinning of the crystalline silicon may be carried out, for example, by chemical mechanical polishing and if necessary or desired, oxidizing the silicon followed by etching to the desired thickness of the silicon.

Final Report, January 1991 - July 1992

NASA Astrophysics Data System (ADS)

Ferrara, Jon

1992-07-01

This report covers final schedules, expenses and billings, monthly reports, testing, and deliveries for this contract. The goal of the detector development program for the Solar and Heliospheric Spacecraft (SOHO) EUV Imaging Telescope (EIT) is an Extreme UltraViolet (EUV) CCD (Change Collecting Device) camera. As a part of the CCD screening effort, the quantum efficiency (QE) of a prototype CCD has been measured in the NRL EUV laboratory over the wavelength range of 256 to 735 Angstroms. A simplified model has been applied to these QE measurements to illustrate the relevant physical processes that determine the performance of the detector. The charge transfer efficiency (CTE) characteristics of the Tektronix 1024 X 1024 CCD being developed for STIS/SOHO space imaging applications have been characterized at different signal levels, operating conditions, and temperatures using a variety of test methods. A number of CCD's have been manufactured using processing techniques developed to improve CTE, and test results on these devices will be used in determining the final chip design. In this paper, we discuss the CTE test methods used and present the results and conclusions of these tests.

EUV emission spectra in collisions of highly charged tantalum ions with nitrogen and oxygen molecules

NASA Astrophysics Data System (ADS)

Tanuma, Hajime; Numadate, Naoki; Uchikura, Yoshiyuki; Shimada, Kento; Akutsu, Takuto; Long, Elaine; O'Sullivan, Gerry

2017-10-01

We have performed ion beam collision experiments using multiply charged tantalum ions and observed EUV (extreme ultra-violet) emission spectra in collisions of ions with molecular targets, N2 and O2. Broad UTAs (un-resolved transition arrays) from multiply charged Ta ions were observed, and the mean wavelengths of the UTAs shifted and became shorter at higher charge statea of Ta ions. These UTAs may be attributed to the 4f-5d and 4f-5g transitions. Not only the UTA emission from incident ions, but also the sharp emission lines from multiply charged fragment atomic ions were observed. Production of temporary highly charged molecular ions, their kinetic energy and fragmentation processes have been investigated with coincident detection technique. However, the observation of emission from the fragments might be for the first time. The formation mechanisms of the multiply charged fragment atomic ions from target molecules are discussed.

Flux Cancelation as the Trigger of Quiet-Region Coronal Jet Eruptions

NASA Technical Reports Server (NTRS)

Panesar, Navdeep K.; Sterling, Alphonse; Moore, Ronald L.

2017-01-01

Coronal jets are frequent magnetically channeled narrow eruptions. They occur in various solar environments: quiet regions, coronal holes and active regions. All coronal jets observed in EUV (Extreme UltraViolet) and X-ray images show a bright spire with a base brightening, also known as jet bright point (JBP). Recent studies show that coronal jets are driven by small-scale filament eruptions. Sterling et al. 2015 did extensive study of 20 polar coronal hole jets and found that X-ray jets are mainly driven by the eruption of minifilaments. What leads to these minifilament eruptions?

Generation of warm dense matter using an argon based capillary discharge laser

NASA Astrophysics Data System (ADS)

Rossall, A. K.; Tallents, G. J.

2015-06-01

Argon based capillary discharge lasers operating in the extreme ultra violet (EUV) at 46.9 nm with output up to 0.5 mJ energy per pulse and repetition rates up to 10 Hz are capable of focused irradiances of 109-1012 W cm-2 and can be used to generate plasma in the warm dense matter regime by irradiating solid material. To model the interaction between such an EUV laser and solid material, the 2D radiative-hydrodynamic code POLLUX has been modified to include absorption via direct photo-ionisation, a super-configuration model to describe the ionization-dependent electronic configurations and a calculation of plasma refractive indices for ray tracing of the incident EUV laser radiation. A simulation study is presented, demonstrating how capillary discharge lasers of 1200 ps pulse duration can be used to generate warm dense matter at close to solid densities with temperatures of a few eV and energy densities up to 1 × 105 J cm-3. Plasmas produced by EUV laser irradiation are shown to be useful for examining the properties of warm dense matter as, for example, plasma emission is not masked by hotter, less dense plasma emission that occurs with visible/infra-red laser target irradiation.

Impact of design-parameters on the optical performance of a high-power adaptive mirror

NASA Astrophysics Data System (ADS)

Koek, Wouter D.; Nijkerk, David; Smeltink, Jeroen A.; van den Dool, Teun C.; van Zwet, Erwin J.; van Baars, Gregor E.

2017-02-01

TNO is developing a High Power Adaptive Mirror (HPAM) to be used in the CO2 laser beam path of an Extreme Ultra- Violet (EUV) light source for next-generation lithography. In this paper we report on a developed methodology, and the necessary simulation tools, to assess the performance and associated sensitivities of this deformable mirror. Our analyses show that, given the current limited insight concerning the process window of EUV generation, the HPAM module should have an actuator pitch of <= 4 mm. Furthermore we have modelled the sensitivity of performance with respect to dimpling and actuator noise. For example, for a deformable mirror with an actuator pitch of 4 mm, and if the associated performance impact is to be limited to smaller than 5%, the actuator noise should be smaller than 45 nm (rms). Our tools assist in the detailed design process by assessing the performance impact of various design choices, including for example those that affect the shape and spectral content of the influence function.

Design Considerations for a Water Treatment System Utilizing Ultra-Violet Light Emitting Diodes

DTIC Science & Technology

2014-03-27

DESIGN CONSIDERATIONS FOR A WATER TREATMENT SYSTEM UTILIZING ULTRA-VIOLET LIGHT EMITTING DIODES...the United States. ii AFIT-ENV-14-M-58 DESIGN CONSIDERATIONS FOR A WATER TREATMENT SYSTEM UTILIZING ULTRA-VIOLET LIGHT EMITTING DIODES...DISTRIBUTION UNLIMITED. iii AFIT-ENV-14-M-58 DESIGN CONSIDERATIONS FOR A WATER TREATMENT SYSTEM UTILIZING ULTRA-VIOLET LIGHT EMITTING

Solar Demon: near real-time solar eruptive event detection on SDO/AIA images

NASA Astrophysics Data System (ADS)

Kraaikamp, Emil; Verbeeck, Cis

Solar flares, dimmings and EUV waves have been observed routinely in extreme ultra-violet (EUV) images of the Sun since 1996. These events are closely associated with coronal mass ejections (CMEs), and therefore provide useful information for early space weather alerts. The Solar Dynamics Observatory/Atmospheric Imaging Assembly (SDO/AIA) generates such a massive dataset that it becomes impossible to find most of these eruptive events manually. Solar Demon is a set of automatic detection algorithms that attempts to solve this problem by providing both near real-time warnings of eruptive events and a catalog of characterized events. Solar Demon has been designed to detect and characterize dimmings, EUV waves, as well as solar flares in near real-time on SDO/AIA data. The detection modules are running continuously at the Royal Observatory of Belgium on both quick-look data and synoptic science data. The output of Solar Demon can be accessed in near real-time on the Solar Demon website, and includes images, movies, light curves, and the numerical evolution of several parameters. Solar Demon is the result of collaboration between the FP7 projects AFFECTS and COMESEP. Flare detections of Solar Demon are integrated into the COMESEP alert system. Here we present the Solar Demon detection algorithms and their output. We will focus on the algorithm and its operational implementation. Examples of interesting flare, dimming and EUV wave events, and general statistics of the detections made so far during solar cycle 24 will be presented as well.

Ultrafast magnetodynamics with free-electron lasers

NASA Astrophysics Data System (ADS)

Malvestuto, Marco; Ciprian, Roberta; Caretta, Antonio; Casarin, Barbara; Parmigiani, Fulvio

2018-02-01

The study of ultrafast magnetodynamics has entered a new era thanks to the groundbreaking technological advances in free-electron laser (FEL) light sources. The advent of these light sources has made possible unprecedented experimental schemes for time-resolved x-ray magneto-optic spectroscopies, which are now paving the road for exploring the ultimate limits of out-of-equilibrium magnetic phenomena. In particular, these studies will provide insights into elementary mechanisms governing spin and orbital dynamics, therefore contributing to the development of ultrafast devices for relevant magnetic technologies. This topical review focuses on recent advancement in the study of non-equilibrium magnetic phenomena from the perspective of time-resolved extreme ultra violet (EUV) and soft x-ray spectroscopies at FELs with highlights of some important experimental results.

Structural properties of Al/Mo/SiC multilayers with high reflectivity for extreme ultraviolet light.

PubMed

Hu, Min-Hui; Le Guen, Karine; André, Jean-Michel; Jonnard, Philippe; Meltchakov, Evgueni; Delmotte, Franck; Galtayries, Anouk

2010-09-13

We present the results of an optical and chemical, depth and surface study of Al/Mo/SiC periodic multilayers, designed as high reflectivity coatings for the extreme ultra-violet (EUV) range. In comparison to the previously studied Al/SiC system, the introduction of Mo as a third material in the multilayer structure allows us to decrease In comparison to the previously studied Al/SiC system with a reflectance of 37% at near normal incidence around 17 nm, the introduction of Mo as a third material in the multilayer structure allows us to decrease the interfacial roughness and achieve an EUV reflectivity of 53.4%, measured with synchrotron radiation. This is the first report of a reflectivity higher than 50% around 17 nm. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) and x-ray photoelectron spectroscopy (XPS) measurements are performed on the Al/Mo/SiC system in order to analyze the individual layers within the stack. ToF-SIMS and XPS results give evidence that the first SiC layer is partially oxidized, but the O atoms do not reach the first Mo and Al layers. We use these results to properly describe the multilayer stack and discuss the possible reasons for the difference between the measured and simulated EUV reflectivity values.

Stability and imaging of the ASML EUV alpha demo tool

NASA Astrophysics Data System (ADS)

Hermans, Jan V.; Baudemprez, Bart; Lorusso, Gian; Hendrickx, Eric; van Dijk, Andre; Jonckheere, Rik; Goethals, Anne-Marie

2009-03-01

Extreme Ultra-Violet (EUV) lithography is the leading candidate for semiconductor manufacturing of the 22nm technology node and beyond, due to the very short wavelength of 13.5nm. However, reducing the wavelength adds complexity to the lithographic process. The impact of the EUV specific conditions on lithographic performance needs to be understood, before bringing EUV lithography into pre-production. To provide early learning on EUV, an EUV fullfield scanner, the Alpha Demo Tool (ADT) from ASML was installed at IMEC, using a Numerical Aperture (NA) of 0.25. In this paper we report on different aspects of the ADT: the imaging and overlay performance and both short and long-term stability. For 40nm dense Lines-Spaces (LS), the ADT shows an across field overlapping process window of 270nm Depth Of Focus (DOF) at 10% Exposure Latitude (EL) and a wafer CD Uniformity (CDU) of 3nm 3σ, without any corrections for process or reticle. The wafer CDU is correlated to different factors that are known to influence the CD fingerprint from traditional lithography: slit intensity uniformity, focus plane deviation and reticle CD error. Taking these contributions into account, the CD through slit fingerprint for 40nm LS is simulated with excellent agreement to experimental data. The ADT shows good CD stability over 9 months of operation, both intrafield and across wafer. The projection optics reflectivity has not degraded over 9 months. Measured overlay performance with respect to a dry tool shows |Mean|+3σ below 20nm with more correction potential by applying field-by-field corrections (|Mean|+3σ <=10nm). For 22nm SRAM application, both contact hole and metal layer were printed in EUV with 10% CD and 15nm overlay control. Below 40nm, the ADT shows good wafer CDU for 30nm dense and isolated lines (on the same wafer) and 38nm dense Contact Holes (CH). First 28nm dense line CDU data are achieved. The results indicate that the ADT can be used effectively for EUV process development before installation of the pre-production tool, the ASML NXE Gen. 1 at IMEC.

Carbon contamination analysis and its effect on extreme ultra violet mask imaging performance using coherent scattering microscopy/in-situ accelerated contamination system.

PubMed

Jeong, Chang Young; Lee, Sangsul; Doh, Jong Gul; Lee, Jae Uk; Cha, Han-sun; Nichols, William T; Lee, Dong Gun; Kim, Seong Sue; Cho, Han Ku; Rah, Seung-yu; Ahn, Jinho

2011-07-01

The coherent scattering microscopy/in-situ accelerated contamination system (CSM/ICS) is a developmental metrology tool designed to analyze the impact of carbon contamination on the imaging performance. It was installed at 11B EUVL beam-line of the Pohang Accelerator Laboratory (PAL). Monochromatized 13.5 nm wavelength beam with Mo/Si multilayer mirrors and zirconium filters was used. The CSM/ICS is composed of the CSM for measuring imaging properties and the ICS for implementing acceleration of carbon contamination. The CSM has been proposed as an actinic inspection technique that records the coherent diffraction pattern from the EUV mask and reconstructs its aerial image using a phase retrieval algorithm. To improve the CSM measurement accuracy, optical and electrical noises of main chamber were minimized. The background noise level measured by CCD camera was approximately 8.5 counts (3 sigma) when the EUV beam was off. Actinic CD measurement repeatability was <1 A (3 sigma) at 17.5 nm line and space pattern. The influence of carbon contamination on the imaging properties can be analyzed by transferring EUV mask to CSM imaging center position after executing carbon contamination without a fine alignment system. We also installed photodiode and ellipsometry for in-situ reflectivity and thickness measurement. This paper describes optical design and system performance observed during the first phase of integration, including CSM imaging performance and carbon contamination analysis results.

STUDIES ON BIOLUMINESCENCE : XVII. FLUORESCENCE AND INHIBITION OF LUMINESCENCE IN CTENOPHORES BY ULTRA-VIOLET LIGHT.

PubMed

Harvey, E N

1925-01-20

1. Small dumps of the luminous cells of Mnemiopsis cannot readily be stimulated mechanically but will luminesce on treatment with saponin solution. Larger groups of luminous cells (such as are connected with two paddle plates) luminesce on mechanical stimulation. This suggests that mechanical stimulation to luminesce occurs chiefly through a nerve mechanism which has been broken up in the small dumps of luminous tissue. 2. The smallest bits of luminous tissue, even cells freed from the animal by agitation, that will pass through filter paper, lose their power to luminesce in daylight and regain it (at least partially) in the dark. 3. Luminescence of the whole animal and of individual cells is suppressed by near ultra-violet light (without visible light). 4. Inhibition in ultra-violet light is not due to stimulation (by the ultra-violet light) of the animal to luminesce, thereby using up the store of photogenic material. 5. Animals stimulated mechanically several times and placed in ultra-violet light show a luminescence along the meridians in the same positions as the luminescence that appears on stimulation. This luminescence in the ultra-violet or "tonic luminescence," is not obtained with light adapted ctenophores and is interpreted to be a fluorescence of the product of oxidation of the photogenic material. 6. Marked fluorescence of the luminous organ of the glowworm (Photuris) and of the luminous slime of Chatopterus may be observed in ultra-violet but no marked fluorescence of the luminous substances of Cypridina is apparent. 7. Evidence is accumulating to show a close relation between fluorescent and chemiluminescent substances in animals, similar to that described for unsaturated silicon compounds and the Grignard reagents.

Ultra violet disinfection: A 3-year history

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tubesing, R.R.; Lindeke, D.R.

1998-07-01

The Stillwater Wastewater Treatment Facility is one of nine wastewater treatment facilities operated by the Metropolitan Council Environmental Services in the Minneapolis-St. Paul Metropolitan Area. The facility services the cities of Stillwater, Oak Park Heights, and Bayport. In 1993, an ultra violet disinfection facility began operation to provide the disinfection for the Facility. This presentation discusses the reasons for using ultra violet disinfection in lieu of chlorination/dechlorination facilities, the operating performance, and operating cost factors.

Ultra-violet radiation is responsible for the differences in global epidemiology of chickenpox and the evolution of varicella-zoster virus as man migrated out of Africa.

PubMed

Rice, Philip S

2011-04-23

Of the eight human herpes viruses, varicella-zoster virus, which causes chickenpox and zoster, has a unique epidemiology. Primary infection is much less common in children in the tropics compared with temperate areas. This results in increased adult susceptibility causing outbreaks, for example in health-care workers migrating from tropical to temperate countries. The recent demonstration that there are different genotypes of varicella-zoster virus and their geographic segregation into tropical and temperate areas suggests a distinct, yet previously unconsidered climatic factor may be responsible for both the clinical and molecular epidemiological features of this virus infection. Unlike other human herpes viruses, varicella-zoster virus does not require intimate contact for infection to occur indicating that transmission may be interrupted by a geographically restricted climatic factor. The factor with the largest difference between tropical and temperate zones is ultra-violet radiation. This could reduce the infectiousness of chickenpox cases by inactivating virus in vesicles, before or after rupture. This would explain decreased transmissibility in the tropics and why the peak chickenpox incidence in temperate zones occurs during winter and spring, when ultra-violet radiation is at its lowest. The evolution of geographically restricted genotypes is also explained by ultra-violet radiation driving natural selection of different virus genotypes with varying degrees of resistance to inactivation, tropical genotypes being the most resistant. Consequently, temperate viruses should be more sensitive to its effects. This is supported by the observation that temperate genotypes are found in the tropics only in specific circumstances, namely where ultra-violet radiation has either been excluded or significantly reduced in intensity. The hypothesis is testable by exposing different virus genotypes to ultra-violet radiation and quantifying virus survival by plaque forming units or quantitative mRNA RT-PCR. The ancestral varicella-zoster virus, most probably a tropical genotype, co-migrated with man as he left Africa approximately 200,000 years ago. For this virus to have lost the selective advantage of resistance to ultra-violet radiation, the hypothesis would predict that the temperate, ultra-violet sensitive virus should have acquired another selective advantage as an evolutionary trade-off. One obvious advantage could be an increased reactivation rate as zoster to set up more rounds of chickenpox transmission. If this were so, the mechanism responsible for resistance to ultra-violet radiation might also be involved in reactivation and latency. This could then provide the first insight into a genetic correlate of the survival strategy of this virus.

Solar Extreme UV radiation and quark nugget dark matter model

NASA Astrophysics Data System (ADS)

Zhitnitsky, Ariel

2017-10-01

We advocate the idea that the surprising emission of extreme ultra violet (EUV) radiation and soft x-rays from the Sun are powered externally by incident dark matter (DM) particles. The energy and the spectral shape of this otherwise unexpected solar irradiation is estimated within the quark nugget dark matter model. This model was originally invented as a natural explanation of the observed ratio Ωdark ~ Ωvisible when the DM and visible matter densities assume the same order of magnitude values. This generic consequence of the model is a result of the common origin of both types of matter which are formed during the same QCD transition and both proportional to the same fundamental dimensional parameter ΛQCD. We also present arguments suggesting that the transient brightening-like "nanoflares" in the Sun may be related to the annihilation events which inevitably occur in the solar atmosphere within this dark matter scenario.

GASEOUS SCINTILLATION COUNTER

DOEpatents

Eggler, C.; Huddleston, C.M.

1959-04-28

A gaseous excitation counter for detecting the presence amd measuring the energy of subatomic particles and electromagnetic radiation is described. The counter includes a gas-tight chamber filled with an elemental gas capable of producing ultra-violet excitation quanta when irradiated with subatomic particles and electromagnetic radiation. The gas has less than one in a thousand parts ultra-violet absorbing contamination. When nuclear radiation ps present the ultra-violet light produced by the gas strikes a fluorescent material within the counter, responsive to produce visible excitation quanta, and photo-sensitive counting means detect the visible emission.

Ultra-violet radiation is responsible for the differences in global epidemiology of chickenpox and the evolution of varicella-zoster virus as man migrated out of Africa

PubMed Central

2011-01-01

Background Of the eight human herpes viruses, varicella-zoster virus, which causes chickenpox and zoster, has a unique epidemiology. Primary infection is much less common in children in the tropics compared with temperate areas. This results in increased adult susceptibility causing outbreaks, for example in health-care workers migrating from tropical to temperate countries. The recent demonstration that there are different genotypes of varicella-zoster virus and their geographic segregation into tropical and temperate areas suggests a distinct, yet previously unconsidered climatic factor may be responsible for both the clinical and molecular epidemiological features of this virus infection. Presentation of the hypothesis Unlike other human herpes viruses, varicella-zoster virus does not require intimate contact for infection to occur indicating that transmission may be interrupted by a geographically restricted climatic factor. The factor with the largest difference between tropical and temperate zones is ultra-violet radiation. This could reduce the infectiousness of chickenpox cases by inactivating virus in vesicles, before or after rupture. This would explain decreased transmissibility in the tropics and why the peak chickenpox incidence in temperate zones occurs during winter and spring, when ultra-violet radiation is at its lowest. The evolution of geographically restricted genotypes is also explained by ultra-violet radiation driving natural selection of different virus genotypes with varying degrees of resistance to inactivation, tropical genotypes being the most resistant. Consequently, temperate viruses should be more sensitive to its effects. This is supported by the observation that temperate genotypes are found in the tropics only in specific circumstances, namely where ultra-violet radiation has either been excluded or significantly reduced in intensity. Testing the Hypothesis The hypothesis is testable by exposing different virus genotypes to ultra-violet radiation and quantifying virus survival by plaque forming units or quantitative mRNA RT-PCR. Implications of the hypothesis The ancestral varicella-zoster virus, most probably a tropical genotype, co-migrated with man as he left Africa approximately 200,000 years ago. For this virus to have lost the selective advantage of resistance to ultra-violet radiation, the hypothesis would predict that the temperate, ultra-violet sensitive virus should have acquired another selective advantage as an evolutionary trade-off. One obvious advantage could be an increased reactivation rate as zoster to set up more rounds of chickenpox transmission. If this were so, the mechanism responsible for resistance to ultra-violet radiation might also be involved in reactivation and latency. This could then provide the first insight into a genetic correlate of the survival strategy of this virus. PMID:21513563

Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure

NASA Astrophysics Data System (ADS)

Nagahara, Seiji; Carcasi, Michael; Shiraishi, Gosuke; Nakagawa, Hisashi; Dei, Satoshi; Shiozawa, Takahiro; Nafus, Kathleen; De Simone, Danilo; Vandenberghe, Geert; Stock, Hans-Jürgen; Küchler, Bernd; Hori, Masafumi; Naruoka, Takehiko; Nagai, Tomoki; Minekawa, Yukie; Iseki, Tomohiro; Kondo, Yoshihiro; Yoshihara, Kosuke; Kamei, Yuya; Tomono, Masaru; Shimada, Ryo; Biesemans, Serge; Nakashima, Hideo; Foubert, Philippe; Buitrago, Elizabeth; Vockenhuber, Michaela; Ekinci, Yasin; Oshima, Akihiro; Tagawa, Seiichi

2017-03-01

A new type of Photosensitized Chemically Amplified Resist (PSCAR) **: "PSCAR 2.0," is introduced in this paper. PSCAR 2.0 is composed of a protected polymer, a "photo acid generator which can be photosensitized" (PS-PAG), a "photo decomposable base (quencher) which can be photosensitized" (PS-PDB) and a photosensitizer precursor (PP). With this PSCAR 2.0, a photosensitizer (PS) is generated by an extreme ultra-violet (EUV) pattern exposure. Then, during a subsequent flood exposure, PS selectively photosensitizes the EUV exposed areas by the decomposition of a PS-PDB in addition to the decomposition of PS-PAG. As these pattern-exposed areas have the additional acid and reduced quencher concentration, the initial quencher loading in PSCAR 2.0 can be increased in order to get the same target critical dimensions (CD). The quencher loading is to be optimized simultaneously with a UV flood exposure dose to achieve the best lithographic performance and resolution. In this work, the PSCAR performance when different quenchers are used is examined by simulation and exposure experiments with the 16 nm half-pitch (HP) line/space (L/S, 1:1) patterns. According to our simulation results among resists with the different quencher types, the best performance was achieved by PSCAR 2.0 using PS-PDB with the highest possible chemical gradient resulting in the lowest line width roughness (LWR). PSCAR 2.0 performance has furthermore been confirmed on ASML's NXE:3300 with TEL's standalone pre-alpha flood exposure tool at imec. The initial PSCAR 2.0 patterning results on NXE:3300 showed the accelerated photosensitization performance with PS-PDB. From these results, we concluded that the dual sensitization of PS-PAG and PS-PDB in PSCAR 2.0 have a potential to realize a significantly improved resist performance in EUV lithography.

Solar Extreme UV radiation and quark nugget dark matter model

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zhitnitsky, Ariel, E-mail: arz@phas.ubc.ca

2017-10-01

We advocate the idea that the surprising emission of extreme ultra violet (EUV) radiation and soft x-rays from the Sun are powered externally by incident dark matter (DM) particles. The energy and the spectral shape of this otherwise unexpected solar irradiation is estimated within the quark nugget dark matter model. This model was originally invented as a natural explanation of the observed ratio Ω{sub dark} ∼ Ω{sub visible} when the DM and visible matter densities assume the same order of magnitude values. This generic consequence of the model is a result of the common origin of both types of mattermore » which are formed during the same QCD transition and both proportional to the same fundamental dimensional parameter Λ{sub QCD}. We also present arguments suggesting that the transient brightening-like 'nanoflares' in the Sun may be related to the annihilation events which inevitably occur in the solar atmosphere within this dark matter scenario.« less

Publications - GMC 386 | Alaska Division of Geological & Geophysical

Science.gov Websites

from the FEX Limited Partnership Aklaq #6 well and white light and ultra-violet photography of the FEX Limited Partnership Aklaq #2, Aklaq #6, and Aklaqyaak #1 wells Authors: Talisman Energy Inc. Publication results from the FEX Limited Partnership Aklaq #6 well and white light and ultra-violet photography of the

Light Therapy in Mental Hospitals

PubMed Central

Cormac, H. Dove

1929-01-01

The position of actinotherapy in Mental Hospitals in this country is reviewed. An investigation of the results of ultra-violet irradiation in mental disorders at Parkside Mental Hospital is described and it is shown that certain types of the psychoses appear to benefit. The physiological action of actinic rays in relation to mental disorders is discussed and their mode of action on the nervous system suggested. Reference is made to substances which sensitize the body tissues to sunlight and ultra-violet radiation. An allusion is made to glass, penetrable by a portion of the actinic rays, and its uses. The need for ultra-violet ray apparatus in every mental hospital is urged both for treatment of mental and physical conditions and for the study of its action. PMID:19986837

VUV Testing of Science Cameras at MSFC: QE Measurement of the CLASP Flight Cameras

NASA Technical Reports Server (NTRS)

Champey, Patrick; Kobayashi, Ken; Winebarger, Amy; Cirtain, Jonathan; Hyde, David; Robertson, Bryan; Beabout, Brent; Beabout, Dyana; Stewart, Mike

2015-01-01

The NASA Marshall Space Flight Center (MSFC) has developed a science camera suitable for sub-orbital missions for observations in the UV, EUV and soft X-ray. Six cameras were built and tested for the Chromospheric Lyman-Alpha Spectro-Polarimeter (CLASP), a joint National Astronomical Observatory of Japan (NAOJ) and MSFC sounding rocket mission. The CLASP camera design includes a frame-transfer e2v CCD57-10 512x512 detector, dual channel analog readout electronics and an internally mounted cold block. At the flight operating temperature of -20 C, the CLASP cameras achieved the low-noise performance requirements (less than or equal to 25 e- read noise and greater than or equal to 10 e-/sec/pix dark current), in addition to maintaining a stable gain of approximately equal to 2.0 e-/DN. The e2v CCD57-10 detectors were coated with Lumogen-E to improve quantum efficiency (QE) at the Lyman- wavelength. A vacuum ultra-violet (VUV) monochromator and a NIST calibrated photodiode were employed to measure the QE of each camera. Four flight-like cameras were tested in a high-vacuum chamber, which was configured to operate several tests intended to verify the QE, gain, read noise, dark current and residual non-linearity of the CCD. We present and discuss the QE measurements performed on the CLASP cameras. We also discuss the high-vacuum system outfitted for testing of UV and EUV science cameras at MSFC.

VUV testing of science cameras at MSFC: QE measurement of the CLASP flight cameras

NASA Astrophysics Data System (ADS)

Champey, P.; Kobayashi, K.; Winebarger, A.; Cirtain, J.; Hyde, D.; Robertson, B.; Beabout, B.; Beabout, D.; Stewart, M.

2015-08-01

The NASA Marshall Space Flight Center (MSFC) has developed a science camera suitable for sub-orbital missions for observations in the UV, EUV and soft X-ray. Six cameras were built and tested for the Chromospheric Lyman-Alpha Spectro-Polarimeter (CLASP), a joint MSFC, National Astronomical Observatory of Japan (NAOJ), Instituto de Astrofisica de Canarias (IAC) and Institut D'Astrophysique Spatiale (IAS) sounding rocket mission. The CLASP camera design includes a frame-transfer e2v CCD57-10 512 × 512 detector, dual channel analog readout and an internally mounted cold block. At the flight CCD temperature of -20C, the CLASP cameras exceeded the low-noise performance requirements (<= 25 e- read noise and <= 10 e- /sec/pixel dark current), in addition to maintaining a stable gain of ≍ 2.0 e-/DN. The e2v CCD57-10 detectors were coated with Lumogen-E to improve quantum efficiency (QE) at the Lyman- wavelength. A vacuum ultra-violet (VUV) monochromator and a NIST calibrated photodiode were employed to measure the QE of each camera. Three flight cameras and one engineering camera were tested in a high-vacuum chamber, which was configured to operate several tests intended to verify the QE, gain, read noise and dark current of the CCD. We present and discuss the QE measurements performed on the CLASP cameras. We also discuss the high-vacuum system outfitted for testing of UV, EUV and X-ray science cameras at MSFC.

AN AUTOMATIC DETECTION METHOD FOR EXTREME-ULTRAVIOLET DIMMINGS ASSOCIATED WITH SMALL-SCALE ERUPTION

DOE Office of Scientific and Technical Information (OSTI.GOV)

Alipour, N.; Safari, H.; Innes, D. E.

2012-02-10

Small-scale extreme-ultraviolet (EUV) dimming often surrounds sites of energy release in the quiet Sun. This paper describes a method for the automatic detection of these small-scale EUV dimmings using a feature-based classifier. The method is demonstrated using sequences of 171 Angstrom-Sign images taken by the STEREO/Extreme UltraViolet Imager (EUVI) on 2007 June 13 and by Solar Dynamics Observatory/Atmospheric Imaging Assembly on 2010 August 27. The feature identification relies on recognizing structure in sequences of space-time 171 Angstrom-Sign images using the Zernike moments of the images. The Zernike moments space-time slices with events and non-events are distinctive enough to be separatedmore » using a support vector machine (SVM) classifier. The SVM is trained using 150 events and 700 non-event space-time slices. We find a total of 1217 events in the EUVI images and 2064 events in the AIA images on the days studied. Most of the events are found between latitudes -35 Degree-Sign and +35 Degree-Sign . The sizes and expansion speeds of central dimming regions are extracted using a region grow algorithm. The histograms of the sizes in both EUVI and AIA follow a steep power law with slope of about -5. The AIA slope extends to smaller sizes before turning over. The mean velocity of 1325 dimming regions seen by AIA is found to be about 14 km s{sup -1}.« less

Cavity-enhanced frequency doubling from 795nm to 397.5nm ultra-violet coherent radiation with PPKTP crystals in the low pump power regime.

PubMed

Wen, Xin; Han, Yashuai; Bai, Jiandong; He, Jun; Wang, Yanhua; Yang, Baodong; Wang, Junmin

2014-12-29

We demonstrate a simple, compact and cost-efficient diode laser pumped frequency doubling system at 795 nm in the low power regime. In two configurations, a bow-tie four-mirror ring enhancement cavity with a PPKTP crystal inside and a semi-monolithic PPKTP enhancement cavity, we obtain 397.5nm ultra-violet coherent radiation of 35mW and 47mW respectively with a mode-matched fundamental power of about 110mW, corresponding to a conversion efficiency of 32% and 41%. The low loss semi-monolithic cavity leads to the better results. The constructed ultra-violet coherent radiation has good power stability and beam quality, and the system has huge potential in quantum optics and cold atom physics.

Cometary Plasma Probed by Rosetta

NASA Astrophysics Data System (ADS)

Galand, Marina; Vigren, Erik; Raghuram, Susarla; Schwartz, Steve; Eriksson, Anders; Edberg, Niklas; Lebreton, Jean-Pierre; Henri, Pierre; Burch, Jim; Fuselier, Stephen; Haessig, Myrtha; Mandt, Kathy; Altwegg, Kathrin; Tzou, Chia-You

2015-04-01

In Fall 2014, comet 67P/Churyumov-Gerasimenko, the main target of the Rosetta mission, was at 3 AU from the Sun. Its outgassing rate was only of the order of 5×1025 s-1 based on Rosetta Orbiter Spectrometer for Ion and Neutral Analysis (ROSINA) / Cometary Pressure Sensor (COPS). Despite such a thin coma, a plasma of cometary origin has been detected by Rosetta Plasma Consortium (RPC) sensors and ROSINA/ Double Focusing Mass Spectrometer (DFMS). Close to the comet they have revealed the presence of a cometary ionosphere, with a hot electron population, consistent with the deposition of Extreme UltraViolet (EUV) solar radiation. We will present a comparison between RPC sensors and an energy deposition model in terms of suprathermal electron intensities [RPC/ Ion and Electron Sensor (IES)] and electron temperature and density [RPC/ LAngmuir Probe (LAP) and RPC/ Mutual Impedance Probe (MIP)]. We will also compare ion composition among the main species, between our ionospheric model and ROSINA/DFMS. We will discuss effects of the space environment on the cometary plasma. Finally, we will highlight any evolution in the cometary plasma as the comet is getting closer to perihelion.

STEREOSCOPIC DETERMINATION OF HEIGHTS OF EXTREME ULTRAVIOLET BRIGHT POINTS USING DATA TAKEN BY SECCHI/EUVI ABOARD STEREO

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kwon, Ryun-Young; Chae, Jongchul; Zhang Jie

2010-05-01

We measure the heights of EUV bright points (BPs) above the solar surface by applying a stereoscopic method to the data taken by the Solar TErrestrial RElations Observatory/SECCHI/Extreme UltraViolet Imager (EUVI). We have developed a three-dimensional reconstruction method for point-like features such as BPs using the simple principle that the position of a point in the three-dimensional space is specified as the intersection of two lines of sight. From a set of data consisting of EUVI 171 A, 195 A, 284 A, and 304 A images taken on 11 days arbitrarily selected during a period of 14 months, we havemore » identified and analyzed 210 individual BPs that were visible on all four passband images and smaller than 30 Mm. The BPs seen in the 304 A images have an average height of 4.4 Mm, and are often associated with the legs of coronal loops. In the 171 A, 195 A, and 284 A images the BPs appear loop-shaped, and have average heights of 5.1, 6.7, and 6.1 Mm, respectively. Moreover, there is a tendency that overlying loops are filled with hotter plasmas. The average heights of BPs in 171 A, 195 A, and 284 A passbands are roughly twice the corresponding average lengths. Our results support the notion that an EUV BP represents a system of small loops with temperature stratification like flaring loops, being consistent with the magnetic reconnection origin.« less

Observations of decay-less low-amplitude kink oscillations of EUV coronal loops

NASA Astrophysics Data System (ADS)

Nisticò, Giuseppe; Nakariakov, Valery; Anfinogentov, Sergey

The high spatial and temporal resolution observations at Extreme Ultra-Violet (EUV) wavelengths from the Atmospheric Imaging Assembly (AIA) of the Solar Dynamics Observatory (SDO) reveal new features in kink oscillations of coronal loops. We show that, in addition to the well-known rapidly decaying oscillations, a new type of kink waves is present, characterized by low-amplitude and undamped oscillations, that we define as decay-less. Typical periods range from 2.5 to 12 min in both regimes and are different for different loops, increasing with the loop length. Estimates of the loop lengths are supported by three dimensional reconstruction of the loop geometry. The amplitude for the decay-less regime is about 1 Mm, close to the spatial resolution of the AIA instruments. The oscillation phase, measured by the cross-correlation method, is found to be constant along each analysed loop, and the spatial structure of the phase of the oscillations corresponds to the fundamental standing kink mode. We show that the observed behaviours are consistent with the empirical model of a damped linear oscillator excited by a continuous low-amplitude harmonic driver, in addition to an eventual impulsive high-amplitude driver. The observed life-time of the oscillations is likely to be determined by the observational conditions rather than any physical damping. However, the balance between the driving and damping is a necessary ingredient of this model. The properties of this type of transverse oscillations make them interesting object of study in the framework of resonant absorption theory and coronal heating process.

EXPERIMENT - APOLLO 16 (UV)

NASA Image and Video Library

1972-06-06

S72-40820 (21 April 1972) --- A color enhancement of a photograph taken on ultra-violet light showing the spectrum of the upper atmosphere of Earth and geocorona. The bright horizontal line is far ultra-violet emission (1216 angstrom) of hydrogen extending 10 degrees (40,000 miles) either side of Earth. The knobby vertical line shows several ultra-violet emissions from Earth's sunlit atmosphere, each "lump" being produced by one type gas (oxygen, nitrogen, helium, etc.). The spectral dispersion is about 10 angstrom per millimeter on this enlargement. The UV camera/spectrograph was operated on the lunar surface by astronaut John W. Young, commander of the Apollo 16 lunar landing mission. It was designed and built at the Naval Research Laboratory, Washington, D.C. While astronauts Young and Charles M. Duke Jr., lunar module pilot, descended in the Lunar Module (LM) "Orion" to explore the Descartes highlands region of the moon, astronaut Thomas K. Mattingly II, command module pilot, remained with the Command and Service Modules (CSM) "Casper" in lunar orbit.

Exploring EUV and SAQP pattering schemes at 5nm technology node

NASA Astrophysics Data System (ADS)

Hamed Fatehy, Ahmed; Kotb, Rehab; Lafferty, Neal; Jiang, Fan; Word, James

2018-03-01

For years, Moore's law keeps driving the semiconductors industry towards smaller dimensions and higher density chips with more devices. Earlier, the correlation between exposure source's wave length and the smallest resolvable dimension, mandated the usage of Deep Ultra-Violent (DUV) optical lithography system which has been used for decades to sustain Moore's law, especially when immersion lithography was introduced with 193nm ArF laser sources. As dimensions of devices get smaller beyond Deep Ultra-Violent (DUV) optical resolution limits, the need for Extremely Ultra-Violent (EUV) optical lithography systems was a must. However, EUV systems were still under development at that time for the mass-production in semiconductors industry. Theretofore, Multi-Patterning (MP) technologies was introduced to swirl about DUV optical lithography limitations in advanced nodes beyond minimum dimension (CD) of 20nm. MP can be classified into two main categories; the first one is to split the target itself across multiple masks that give the original target patterns when they are printed. This category includes Double, Triple and Quadruple patterning (DP, TP, and QP). The second category is the Self-Aligned Patterning (SAP) where the target is divided into Mandrel patterns and non-Mandrel patterns. The Mandrel patterns get printed first, then a self-aligned sidewalls are grown around these printed patterns drawing the other non-Mandrel targets, afterword, a cut mask(s) is used to define target's line-ends. This approach contains Self-Aligned-Double Pattering (SADP) and Self-Aligned- Quadruple-Pattering (SAQP). DUV and MP along together paved the way for the industry down to 7nm. However, with the start of development at the 5nm node and the readiness of EUV, the differentiation question is aroused again, which pattering approach should be selected, direct printing using EUV or DUV with MP, or a hybrid flow that contains both DUV-MP and EUV. In this work we are comparing two potential pattering techniques for Back End Of Line (BEOL) metal layers in the 5nm technology node, the first technique is Single Exposure EUV (SE-EUV) with a Direct Patterning EUV lithography process, and the second one is Self-Aligned Quadruple Patterning (SAQP) with a hybrid lithography processes, where the drawn metal target layer is decomposed into a Mandrel mask and Blocks/Cut mask, Mandrel mask is printed using DUV 193i lithography process, while Block/Cut Mask is printed using SE-EUV lithography process. The pros and cons of each technique are quantified based on Edge-Placement-Error (EPE) and Process Variation Band (PVBand) measured at 1D and 2D edges. The layout used in this comparison is a candidate layout for Foundries 5nm process node.

Microgap ultra-violet detector

DOEpatents

Wuest, Craig R.; Bionta, Richard M.

1994-01-01

A microgap ultra-violet detector of photons with wavelengths less than 400 run (4000 Angstroms) which comprises an anode and a cathode separated by a gas-filled gap and having an electric field placed across the gap. Either the anode or the cathode is semi-transparent to UV light. Upon a UV photon striking the cathode an electron is expelled and accelerated across the gap by the electric field causing interactions with other electrons to create an electron avalanche which contacts the anode. The electron avalanche is detected and converted to an output pulse.

Microgap ultra-violet detector

DOEpatents

Wuest, C.R.; Bionta, R.M.

1994-09-20

A microgap ultra-violet detector of photons with wavelengths less than 400 run (4,000 Angstroms) which comprises an anode and a cathode separated by a gas-filled gap and having an electric field placed across the gap is disclosed. Either the anode or the cathode is semi-transparent to UV light. Upon a UV photon striking the cathode an electron is expelled and accelerated across the gap by the electric field causing interactions with other electrons to create an electron avalanche which contacts the anode. The electron avalanche is detected and converted to an output pulse. 2 figs.

Field-of-View Guiding Camera on the HISAKI (SPRINT-A) Satellite

NASA Astrophysics Data System (ADS)

Yamazaki, A.; Tsuchiya, F.; Sakanoi, T.; Uemizu, K.; Yoshioka, K.; Murakami, G.; Kagitani, M.; Kasaba, Y.; Yoshikawa, I.; Terada, N.; Kimura, T.; Sakai, S.; Nakaya, K.; Fukuda, S.; Sawai, S.

2014-11-01

HISAKI (SPRINT-A) satellite is an earth-orbiting Extreme UltraViolet (EUV) spectroscopic mission and launched on 14 Sep. 2013 by the launch vehicle Epsilon-1. Extreme ultraviolet spectroscope (EXCEED) onboard the satellite will investigate plasma dynamics in Jupiter's inner magnetosphere and atmospheric escape from Venus and Mars. EUV spectroscopy is useful to measure electron density and temperature and ion composition in plasma environment. EXCEED also has an advantage to measure spatial distribution of plasmas around the planets. To measure radial plasma distribution in the Jovian inner magnetosphere and plasma emissions from ionosphere, exosphere and tail separately (for Venus and Mars), the pointing accuracy of the spectroscope should be smaller than spatial structures of interest (20 arc-seconds). For satellites in the low earth orbit (LEO), the pointing displacement is generally caused by change of alignment between the satellite bus module and the telescope due to the changing thermal inputs from the Sun and Earth. The HISAKI satellite is designed to compensate the displacement by tracking the target with using a Field-Of-View (FOV) guiding camera. Initial checkout of the attitude control for the EXCEED observation shows that pointing accuracy kept within 2 arc-seconds in a case of "track mode" which is used for Jupiter observation. For observations of Mercury, Venus, Mars, and Saturn, the entire disk will be guided inside slit to observe plasma around the planets. Since the FOV camera does not capture the disk in this case, the satellite uses a star tracker (STT) to hold the attitude ("hold mode"). Pointing accuracy during this mode has been 20-25 arc-seconds. It has been confirmed that the attitude control works well as designed.

Ultra-fast switching of light by absorption saturation in vacuum ultra-violet region.

PubMed

Yoneda, Hitoki; Inubushi, Yuichi; Tanaka, Toshihiro; Yamaguchi, Yuta; Sato, Fumiya; Morimoto, Shunsuke; Kumagai, Taisuke; Nagasono, Mitsuru; Higashiya, Atsushi; Yabashi, Makina; Ishikawa, Tetsuya; Ohashi, Haruhiko; Kimura, Hiroaki; Kitamura, Hikaru; Kodama, Ryosuke

2009-12-21

Advances in free electron lasers producing high energy photons [Nat. Photonics 2(9), 555-559 (2008)] are expected to open up a new science of nonlinear optics of high energy photons. Specifically, lasers of photon energy higher than the plasma frequency of a metal can show new interaction features because they can penetrate deeply into metals without strong reflection. Here we show the observation of ultra-fast switching of vacuum ultra-violet (VUV) light caused by saturable absorption of a solid metal target. A strong gating is observed at energy fluences above 6J/cm2 at wavelength of 51 nm with tin metal thin layers. The ratio of the transmission at high intensity to low intensity is typically greater than 100:1. This means we can design new nonlinear photonic devices such as auto-correlator and pulse slicer for the VUV region.

Empirical Modeling of the Plasmasphere Dynamics Using Neural Networks

NASA Astrophysics Data System (ADS)

Zhelavskaya, I. S.; Shprits, Y.; Spasojevic, M.

2017-12-01

We present a new empirical model for reconstructing the global dynamics of the cold plasma density distribution based only on solar wind data and geomagnetic indices. Utilizing the density database obtained using the NURD (Neural-network-based Upper hybrid Resonance Determination) algorithm for the period of October 1, 2012 - July 1, 2016, in conjunction with solar wind data and geomagnetic indices, we develop a neural network model that is capable of globally reconstructing the dynamics of the cold plasma density distribution for 2 ≤ L ≤ 6 and all local times. We validate and test the model by measuring its performance on independent datasets withheld from the training set and by comparing the model predicted global evolution with global images of He+ distribution in the Earth's plasmasphere from the IMAGE Extreme UltraViolet (EUV) instrument. We identify the parameters that best quantify the plasmasphere dynamics by training and comparing multiple neural networks with different combinations of input parameters (geomagnetic indices, solar wind data, and different durations of their time history). We demonstrate results of both local and global plasma density reconstruction. This study illustrates how global dynamics can be reconstructed from local in-situ observations by using machine learning techniques.

Ultra-low roughness magneto-rheological finishing for EUV mask substrates

NASA Astrophysics Data System (ADS)

Dumas, Paul; Jenkins, Richard; McFee, Chuck; Kadaksham, Arun J.; Balachandran, Dave K.; Teki, Ranganath

2013-09-01

EUV mask substrates, made of titania-doped fused silica, ideally require sub-Angstrom surface roughness, sub-30 nm flatness, and no bumps/pits larger than 1 nm in height/depth. To achieve the above specifications, substrates must undergo iterative global and local polishing processes. Magnetorheological finishing (MRF) is a local polishing technique which can accurately and deterministically correct substrate figure, but typically results in a higher surface roughness than the current requirements for EUV substrates. We describe a new super-fine MRF® polishing fluid whichis able to meet both flatness and roughness specifications for EUV mask blanks. This eases the burden on the subsequent global polishing process by decreasing the polishing time, and hence the defectivity and extent of figure distortion.

A novel technique to measure intensity fluctuations in EUV images and to detect coronal sound waves nearby active regions

NASA Astrophysics Data System (ADS)

Stenborg, G.; Marsch, E.; Vourlidas, A.; Howard, R.; Baldwin, K.

2011-02-01

Context. In the past years, evidence for the existence of outward-moving (Doppler blue-shifted) plasma and slow-mode magneto-acoustic propagating waves in various magnetic field structures (loops in particular) in the solar corona has been found in ultraviolet images and spectra. Yet their origin and possible connection to and importance for the mass and energy supply to the corona and solar wind is still unclear. There has been increasing interest in this problem thanks to the high-resolution observations available from the extreme ultraviolet (EUV) imagers on the Solar TErrestrial RElationships Observatory (STEREO) and the EUV spectrometer on the Hinode mission. Aims: Flows and waves exist in the corona, and their signatures appear in EUV imaging observations but are extremely difficult to analyse quantitatively because of their weak intensity. Hence, such information is currently available mostly from spectroscopic observations that are restricted in their spatial and temporal coverage. To understand the nature and origin of these fluctuations, imaging observations are essential. Here, we present measurements of the speed of intensity fluctuations observed along apparently open field lines with the Extreme UltraViolet Imagers (EUVI) onboard the STEREO mission. One aim of our paper is to demonstrate that we can make reliable kinematic measurements from these EUV images, thereby complementing and extending the spectroscopic measurements and opening up the full corona for such an analysis. Another aim is to examine the assumptions that lead to flow versus wave interpretation for these fluctuations. Methods: We have developed a novel image-processing method by fusing well established techniques for the kinematic analysis of coronal mass ejections (CME) with standard wavelet analysis. The power of our method lies with its ability to recover weak intensity fluctuations along individual magnetic structures at any orientation , anywhere within the full solar disk , and using standard synoptic observing sequences (cadence <3 min) without the need for special observation plans. Results: Using information from both EUVI imagers, we obtained wave phase speeds with values on the order of 60-90 km s-1, compatible with those obtained by other previous measurements. Moreover, we studied the periodicity of the observed fluctuations and established a predominance of a 16-min period, and other periods that seem to be multiples of an underlying 8-min period. Conclusions: The validation of our analysis technique opens up new possibilities for the study of coronal flows and waves, by extending it to the full disk and to a larger number of coronal structures than has been possible previously. It opens up a new scientific capability for the EUV observations from the recently launched Solar Dynamics Observatory. Here we clearly establish the ubiquitous existence of sound waves which continuously propagate along apparently open magnetic field lines. Movies 1 and 2 (Figs. 12 and 13) are only available in electronic form at http://www.aanda.org

Oxidation preventative capping layer for deep-ultra-violet and soft x-ray multilayers

DOEpatents

Prisbrey, Shon T.

2004-07-06

The invention uses iridium and iridium compounds as a protective capping layer on multilayers having reflectivity in the deep ultra-violet to soft x-ray regime. The iridium compounds can be formed in one of two ways: by direct deposition of the iridium compound from a prepared target or by depositing a thin layer (e.g., 5-50 angstroms) of iridium directly onto an element. The deposition energy of the incoming iridium is sufficient to activate the formation of the desired iridium compound. The compounds of most interest are iridium silicide (IrSi.sub.x) and iridium molybdenide (IrMo.sub.x).

Availability of underlayer application to EUV process

NASA Astrophysics Data System (ADS)

Kosugi, Hitoshi; Fonseca, Carlos; Iwao, Fumiko; Marumoto, Hiroshi; Kim, Hyun-Woo; Cho, Kyoungyong; Park, Cheol-Hong; Park, Chang-Min; Na, Hai-Sub; Koh, Cha-Won; Cho, Hanku

2011-04-01

EUV lithography is one of the most promising technologies for the fabrication of beyond 30nm HP generation devices. However, it is well-known that EUV lithography still has significant challenges. A great concern is the change of resist material for EUV resist process. EUV resist material formulations will likely change from conventional-type materials. As a result, substrate dependency needs to be understood. TEL has reported that the simulation combined with experiments is a good way to confirm the substrate dependency. In this work the application of HMDS treatment and SiON introduction, as an underlayer, are studied to cause a footing of resist profile. Then, we applied this simulation technique to Samsung EUV process. We will report the benefit of this simulation work and effect of underlayer application. Regarding the etching process, underlayer film introduction could have significant issues because the film that should be etched off increases. For that purpose, thinner films are better for etching. In general, thinner films may have some coating defects. We will report the coating coverage performance and defectivity of ultra thin film coating.

Bias Selectable Dual Band AlGaN Ultra-violet Detectors

NASA Technical Reports Server (NTRS)

Yan, Feng; Miko, Laddawan; Franz, David; Guan, Bing; Stahle, Carl M.

2007-01-01

Bias selectable dual band AlGaN ultra-violet (UV) detectors, which can separate UV-A and UV-B using one detector in the same pixel by bias switching, have been designed, fabricated and characterized. A two-terminal n-p-n photo-transistor-like structure was used. When a forward bias is applied between the top electrode and the bottom electrode, the detectors can successfully detect W-A and reject UV-B. Under reverse bias, they can detect UV-B and reject UV-A. The proof of concept design shows that it is feasible to fabricate high performance dual-band UV detectors based on the current AlGaN material growth and fabrication technologies.

Goddard High Resolution Spectrograph Observations of Variability in the RS Canum Venaticorum System V711 Tauri (HR 1099)

NASA Technical Reports Server (NTRS)

Dempsey, Robert C.; Neff, James E.; Thorpe, Marjorie J.; Linsky, Jeffrey L.; Brown, Alexander; Cutispoto, Giuseppe; Rodono, Marcello

1996-01-01

Goddard High Resolution Spectrograph (GHRS) observations of the RS CVn-type binary V711 Tau (Kl IV+G5 IV) were obtained at several phases over two consecutive stellar orbital cycles in order to study ultraviolet emission-line profile and flux variability. Spectra cover the Mg II h and k lines, C IV doublet, and Si IV region, as well as the density-sensitive lines of C III] (1909 A) and Si III] (1892 A). IUE spectra, Extreme Ultra Violet (EUV) data, and Ultraviolet, Blue, Visual (UBV) photometry were obtained contemporaneously with the GHRS data. Variable extended wings were detected in the Mg II lines. We discuss the Mg II line profile variability using various Gaussian emission profile models. No rotational modulation of the line profiles was observed, but there were several large flares. These flares produced enhanced emission in the extended line wings, radial velocity shifts, and asymmetries in some line profiles. Nearly continuous flaring for more than 24 hr, as indicated in the IUE data, represents the most energetic and long-lived chromospheric and transition region flare ever observed with a total energy much greater than 5 x 10(exp 35) ergs. The C III] to Si III] line ratio is used to estimate the plasma density during the flares.

STEREO OBSERVATIONS OF FAST MAGNETOSONIC WAVES IN THE EXTENDED SOLAR CORONA ASSOCIATED WITH EIT/EUV WAVES

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kwon, Ryun-Young; Ofman, Leon; Kramar, Maxim

2013-03-20

We report white-light observations of a fast magnetosonic wave associated with a coronal mass ejection observed by STEREO/SECCHI/COR1 inner coronagraphs on 2011 August 4. The wave front is observed in the form of density compression passing through various coronal regions such as quiet/active corona, coronal holes, and streamers. Together with measured electron densities determined with STEREO COR1 and Extreme UltraViolet Imager (EUVI) data, we use our kinematic measurements of the wave front to calculate coronal magnetic fields and find that the measured speeds are consistent with characteristic fast magnetosonic speeds in the corona. In addition, the wave front turns outmore » to be the upper coronal counterpart of the EIT wave observed by STEREO EUVI traveling against the solar coronal disk; moreover, stationary fronts of the EIT wave are found to be located at the footpoints of deflected streamers and boundaries of coronal holes, after the wave front in the upper solar corona passes through open magnetic field lines in the streamers. Our findings suggest that the observed EIT wave should be in fact a fast magnetosonic shock/wave traveling in the inhomogeneous solar corona, as part of the fast magnetosonic wave propagating in the extended solar corona.« less

EUV tools: hydrogen gas purification and recovery strategies

NASA Astrophysics Data System (ADS)

Landoni, Cristian; Succi, Marco; Applegarth, Chuck; Riddle Vogt, Sarah

2015-03-01

The technological challenges that have been overcome to make extreme ultraviolet lithography (EUV) a reality have been enormous1. This vacuum driven technology poses significant purity challenges for the gases employed for purging and cleaning the scanner EUV chamber and source. Hydrogen, nitrogen, argon and ultra-high purity compressed dry air (UHPCDA) are the most common gases utilized at the scanner and source level. Purity requirements are tighter than for previous technology node tools. In addition, specifically for hydrogen, EUV tool users are facing not only gas purity challenges but also the need for safe disposal of the hydrogen at the tool outlet. Recovery, reuse or recycling strategies could mitigate the disposal process and reduce the overall tool cost of operation. This paper will review the types of purification technologies that are currently available to generate high purity hydrogen suitable for EUV applications. Advantages and disadvantages of each purification technology will be presented. Guidelines on how to select the most appropriate technology for each application and experimental conditions will be presented. A discussion of the most common approaches utilized at the facility level to operate EUV tools along with possible hydrogen recovery strategies will also be reported.

Anomalous Temporal Behaviour of Broadband Ly Alpha Observations During Solar Flares from SDO/EVE

NASA Technical Reports Server (NTRS)

Milligan, Ryan O.; Chamberlin, Phillip C.

2016-01-01

Although it is the most prominent emission line in the solar spectrum, there has been a notable lack of studies devoted to variations in Lyman-alpha (Ly-alpha) emission during solar flares in recent years. However, the few examples that do exist have shown Ly-alpha emission to be a substantial radiator of the total energy budget of solar flares (of the order of 10 percent). It is also a known driver of fluctuations in the Earth's ionosphere. The EUV (Extreme Ultra-Violet) Variability Experiment (EVE) on board the Solar Dynamics Observatory (SDO) now provides broadband, photometric Ly-alpha data at 10-second cadence with its Multiple EUV Grating Spectrograph-Photometer (MEGS-P) component, and has observed scores of solar flares in the 5 years since it was launched. However, the MEGS-P time profiles appear to display a rise time of tens of minutes around the time of the flare onset. This is in stark contrast to the rapid, impulsive increase observed in other intrinsically chromospheric features (H-alpha, Ly-beta, LyC, C III, etc.). Furthermore, the emission detected by MEGS-P peaks around the time of the peak of thermal soft X-ray emission and not during the impulsive phase when energy deposition in the chromosphere (often assumed to be in the form of non-thermal electrons) is greatest. The time derivative of Ly-alpha lightcurves also appears to resemble that of the time derivative of soft X-rays, reminiscent of the Neupert effect. Given that spectrally-resolved Ly-alpha observations during flares from SORCE / SOLSTICE (Solar Radiation and Climate Experiment / Solar Stellar Irradiance Comparison Experiment) peak during the impulsive phase as expected, this suggests that the atypical behaviour of MEGS-P data is a manifestation of the broadband nature of the observations. This could imply that other lines andor continuum emission that becomes enhanced during flares could be contributing to the passband. Users are hereby urged to exercise caution when interpreting broadband Ly-alpha observations of solar flares. Comparisons have also been made with other broadband Ly-alpha photometers such as PROBA2 (Project for On-Board Autonomy-2) / LYRA (Lyman Alpha Radiometer) and GOES (Geostationary Operational Environmental Satellite) / EUVE (Extreme Ultraviolet Explorer).

ERUPTING FILAMENTS WITH LARGE ENCLOSING FLUX TUBES AS SOURCES OF HIGH-MASS THREE-PART CMEs, AND ERUPTING FILAMENTS IN THE ABSENCE OF ENCLOSING FLUX TUBES AS SOURCES OF LOW-MASS UNSTRUCTURED CMEs

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hutton, Joe; Morgan, Huw, E-mail: joh9@aber.ac.uk

2015-11-01

The 3-part appearance of many coronal mass ejections (CMEs) arising from erupting filaments emerges from a large magnetic flux tube structure, consistent with the form of the erupting filament system. Other CMEs arising from erupting filaments lack a clear 3-part structure and reasons for this have not been researched in detail. This paper aims to further establish the link between CME structure and the structure of the erupting filament system and to investigate whether CMEs which lack a 3-part structure have different eruption characteristics. A survey is made of 221 near-limb filament eruptions observed from 2013 May 03 to 2014more » June 30 by Extreme UltraViolet (EUV) imagers and coronagraphs. Ninety-two filament eruptions are associated with 3-part structured CMEs, 41 eruptions are associated with unstructured CMEs. The remaining 88 are categorized as failed eruptions. For 34% of the 3-part CMEs, processing applied to EUV images reveals the erupting front edge is a pre-existing loop structure surrounding the filament, which subsequently erupts with the filament to form the leading bright front edge of the CME. This connection is confirmed by a flux-rope density model. Furthermore, the unstructured CMEs have a narrower distribution of mass compared to structured CMEs, with total mass comparable to the mass of 3-part CME cores. This study supports the interpretation of 3-part CME leading fronts as the outer boundaries of a large pre-existing flux tube. Unstructured (non 3-part) CMEs are a different family to structured CMEs, arising from the eruption of filaments which are compact flux tubes in the absence of a large system of enclosing closed field.« less

Control of the sidewall angle of an absorber stack using the Faraday cage system for the change of pattern printability in EUVL

NASA Astrophysics Data System (ADS)

Jang, Il-Yong; Huh, Sung-Min; Moon, Seong-Yong; Woo, Sang-Gyun; Lee, Jin-Kwan; Moon, Sang Heup; Cho, HanKu

2008-10-01

A patterned TaN substrate, which is candidate for a mask absorber in extreme ultra-violet lithography (EUVL), was etched to have inclined sidewalls by using a Faraday cage system under the condition of a 2-step process that allowed the high etch selectivity of TaN over the resist. The sidewall angle (SWA) of the patterned substrate, which was in the shape of a parallelogram after etching, could be controlled by changing the slope of a substrate holder that was placed in the Faraday cage. The performance of an EUV mask, which contained the TaN absorber of an oblique pattern over the molybdenum/silicon multi-layer, was simulated for different cases of SWA. The results indicated that the optical properties, such as the critical dimension (CD), an offset in the CD bias between horizontal and vertical patterns (H-V bias), and a shift in the image position on the wafer, could be controlled by changing the SWA of the absorber stack. The simulation result showed that the effect of the SWA on the optical properties became more significant at larger thicknesses of the absorber and smaller sizes of the target CD. Nevertheless, the contrast of the aerial images was not significantly decreased because the shadow effect caused by either sidewall of the patterned substrate cancelled with each other.

A HOT FLUX ROPE OBSERVED BY SDO/AIA

DOE Office of Scientific and Technical Information (OSTI.GOV)

Aparna, V.; Tripathi, Durgesh, E-mail: aparnav@iucaa.in

2016-03-01

A filament eruption was observed on 2010 October 31 in the images recorded by the Atmospheric Imaging Assembly (AIA) on board the Solar Dynamic Observatory (SDO) in its Extreme Ultra-Violet (EUV) channels. The filament showed a slow-rise phase followed by a fast rise and was classified to be an asymmetric eruption. In addition, multiple localized brightenings which were spatially and temporally associated with the slow-rise phase were identified, leading us to believe that the tether-cutting mechanism initiated the eruption. An associated flux rope was detected in high-temperature channels of AIA, namely 94 and 131 Å, corresponding to 7 and 11more » MK plasma respectively. In addition, these channels are also sensitive to cooler plasma corresponding to 1–2 MK. In this study, we have applied the algorithm devised by Warren et al. to remove cooler emission from the 94 Å channel to deduce only the high-temperature structure of the flux rope and to study its temporal evolution. We found that the flux rope was very clearly seen in the clean 94 Å channel image corresponding to Fe xviii emission, which corresponds to a plasma at a temperature of 7 MK. This temperature matched well with that obtained using Differential Emission Measure analysis. This study provides important constrains in the modeling of the thermodynamic structure of the flux ropes in coronal mass ejections.« less

Wastewater Disinfectants: Many Called--Few Chosen

ERIC Educational Resources Information Center

Smith, James W.

1978-01-01

Gives a comparative study of disinfectants used to rid wastewater of pathogens. Concentrates on the effects of chlorine and ozone, with some mention of ultra-violet irradiation, bromine chloride, and chlorine dioxide. (MA)

REACTION OF AMINO-ACIDS AND PEPTIDE BONDS WITH FORMALDEHYDE AS MEASURED BY CHANGES IN THE ULTRA-VIOLET SPECTRA,

DTIC Science & Technology

AMINO ACIDS , CHEMICAL REACTIONS), (*PEPTIDES, CHEMICAL REACTIONS), (*FORMALDEHYDE, CHEMICAL REACTIONS), (*ULTRAVIOLET SPECTROSCOPY, PROTEINS), ABSORPTION SPECTRA, CHEMICAL BONDS, AMIDES, CHEMICAL EQUILIBRIUM, REACTION KINETICS

Optical and thermogravimetric analysis of Zn1-xCuxS/PVA nanocomposite films

NASA Astrophysics Data System (ADS)

Mohamed, Mohamed Bakr; Heiba, Zein K.; Imam, N. G.

2018-07-01

Cu doped ZnS nanoparticles with cubic blend structure had been prepared successfully through thermolysis route and then composited with poly vinyl alcohol using casting method. Zn1-xCuxS/PVA nanocomposites were characterized using different characterization techniques. The quantum dot nature of the ZnS:Cu phase was confirmed by transmission electron microscope technique. Thermal stability was studied by thermogravimetric analysis. The ultra violet measurements illustrated that addition of Zn1-xCuxS nanoparticles to PVA matrix increased the film absorbance. Furthermore, the energy gap and refractive index of the composites were obtained from ultra violet and photoluminescence spectrophotometers. The photoluminescence spectra of ZnS:Cu/PVA nanocomposite films demonstrated a quite broad emission peak at 435 nm with highest photoluminescence intensity in nanocomposite doped with 1% Cu.

New Metallicty Calibration for Dwarfs for the RGU-Photometry

NASA Astrophysics Data System (ADS)

Karaali, Salih; Bilir, Selçuk

2002-10-01

We adopted the procedure of Carney to obtain a metallicity calibration for dwarfs for the RGU photometry. For this purpose we selected 76 dwarfs of different metallicities from Carney, and Strobel et al., and evaluated their δ(U-G) ultra-violet excess relative to Hyades by transforming their UBV magnitudes to RGU via metallicity dependent equations of Ak-Güngör. The δ0.6/ΔM normalized factors of Sandage transform Δ(U-G) excess at any G-R to δ=δ1.08, i.e.: the ultra-violet excess at G-R = 1.08 mag, corresponding to B-V = 0.60 mag in the UBV-system. Finally, the (δ, [Fe/H]) couples were fitted by the equation [Fe/H] = 0.11-2.22δ-7.95δ2. This calibration covers the metallicity interval (-2.20, +0.20) dex.

Detection of biological warfare agents using ultra violet-laser induced fluorescence LIDAR

NASA Astrophysics Data System (ADS)

Joshi, Deepti; Kumar, Deepak; Maini, Anil K.; Sharma, Ramesh C.

This review has been written to highlight the threat of biological warfare agents, their types and detection. Bacterial biological agent Bacillus anthracis (bacteria causing the disease anthrax) which is most likely to be employed in biological warfare is being discussed in detail. Standoff detection of biological warfare agents in aerosol form using Ultra violet-Laser Induced Fluorescence (UV-LIF) spectroscopy method has been studied. Range-resolved detection and identification of biological aerosols by both nano-second and non-linear femto-second LIDAR is also discussed. Calculated received fluorescence signal for a cloud of typical biological agent Bacillus globigii (Simulants of B. anthracis) at a location of ˜5.0 km at different concentrations in presence of solar background radiation has been described. Overview of current research efforts in internationally available working UV-LIF LIDAR systems are also mentioned briefly.

Impact contribution of prebiotic reactants to Earth

NASA Technical Reports Server (NTRS)

Aggarwal, Hans R.

1993-01-01

A study was performed to explore the effectiveness of comets for chemical evolution. The concentration of amino acids in various terrestrial environments was mathematically explored as there is evidence that amino acids formed as a result of cometary impact. First, the initial concentration of amino acids in surface environment after cometary impact was estimated. The effect of hydrothermal vents, ultra-violet rays, and clays was taken into consideration. Next, the absorption of amino acids by clay particles before degradation by ultra-violet light was analyzed. Finally, the effectiveness of clays, ultra-violet, and hydrothermal vents as sinks for cometary amino acids was compared. A mathematical model was then developed for the production of impact deposits on Earth for the past 2 Ga, and the relative thickness distribution was computed for impact deposits produced in 2 Ga. The reported relative thickness distribution of tillites and diamicites of all ages agrees with the thickness calculated from this impact model. This suggests that many of the ancient tillites and diamicites could be of impact origin. The effectiveness of comets was explored on the chemical evolution of amino acids. The effect of sinks such as clays, submarine vents, and UV light on amino acid concentration was considered. Sites favorable to chemical evolution of amino acids were examined, and it was concluded that chemical evolution could have occurred at or above the surface even during periods of intense bombardment of the Earth more than 3.8 billion years ago.

Impact contribution of prebiotic reactants to Earth

NASA Astrophysics Data System (ADS)

Aggarwal, Hans R.

1993-03-01

A study was performed to explore the effectiveness of comets for chemical evolution. The concentration of amino acids in various terrestrial environments was mathematically explored as there is evidence that amino acids formed as a result of cometary impact. First, the initial concentration of amino acids in surface environment after cometary impact was estimated. The effect of hydrothermal vents, ultra-violet rays, and clays was taken into consideration. Next, the absorption of amino acids by clay particles before degradation by ultra-violet light was analyzed. Finally, the effectiveness of clays, ultra-violet, and hydrothermal vents as sinks for cometary amino acids was compared. A mathematical model was then developed for the production of impact deposits on Earth for the past 2 Ga, and the relative thickness distribution was computed for impact deposits produced in 2 Ga. The reported relative thickness distribution of tillites and diamicites of all ages agrees with the thickness calculated from this impact model. This suggests that many of the ancient tillites and diamicites could be of impact origin. The effectiveness of comets was explored on the chemical evolution of amino acids. The effect of sinks such as clays, submarine vents, and UV light on amino acid concentration was considered. Sites favorable to chemical evolution of amino acids were examined, and it was concluded that chemical evolution could have occurred at or above the surface even during periods of intense bombardment of the Earth more than 3.8 billion years ago.

Ultra Violet Waterworks (UVW)

Science.gov Websites

cheaply disinfect water. It is a uniquely effective device that operates using the equivalent of a 60-Watt - Curriculum Vita Top Some links on this page may take you to non-federal websites. Their policies may differ

Particle and chemical control using tunnel flow

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chilese, Frank; Delgado, Gildardo R.; Wack, Daniel

An apparatus for contaminant control, having: a first optical assembly including: a first light homogenizer tunnel with: a first end connected to an extreme ultra-violet light source, a second end in communication with a destination chamber, a first enclosed space, and, a first gas input arranged to introduce a first gas such that the first gas flows in a first direction toward the first end and in a second direction toward the second end. The apparatus alternately having: a second optical assembly including: a second light homogenizer tunnel with: a third end connected to an extreme ultra-violet light source, amore » fourth end in communication with a destination chamber, a second enclosed space, a diffusion barrier tube including: a fifth end facing the fourth end and a sixth end in communication with a destination chamber, and a second gas input between the second light homogenizer tunnel and the diffusion tube.« less

Detection of biological warfare agents using ultra violet-laser induced fluorescence LIDAR.

PubMed

Joshi, Deepti; Kumar, Deepak; Maini, Anil K; Sharma, Ramesh C

2013-08-01

This review has been written to highlight the threat of biological warfare agents, their types and detection. Bacterial biological agent Bacillus anthracis (bacteria causing the disease anthrax) which is most likely to be employed in biological warfare is being discussed in detail. Standoff detection of biological warfare agents in aerosol form using Ultra violet-Laser Induced Fluorescence (UV-LIF) spectroscopy method has been studied. Range-resolved detection and identification of biological aerosols by both nano-second and non-linear femto-second LIDAR is also discussed. Calculated received fluorescence signal for a cloud of typical biological agent Bacillus globigii (Simulants of B. anthracis) at a location of ~5.0 km at different concentrations in presence of solar background radiation has been described. Overview of current research efforts in internationally available working UV-LIF LIDAR systems are also mentioned briefly. Copyright © 2013 Elsevier B.V. All rights reserved.

Characteristics of EUV Coronal Jets Observed with STEREO/SECCHI

NASA Astrophysics Data System (ADS)

Nisticò, G.; Bothmer, V.; Patsourakos, S.; Zimbardo, G.

2009-10-01

In this paper we present the first comprehensive statistical study of EUV coronal jets observed with the SECCHI (Sun Earth Connection Coronal and Heliospheric Investigation) imaging suites of the two STEREO spacecraft. A catalogue of 79 polar jets is presented, identified from simultaneous EUV and white-light coronagraph observations, taken during the time period March 2007 to April 2008, when solar activity was at a minimum. The twin spacecraft angular separation increased during this time interval from 2 to 48 degrees. The appearances of the coronal jets were always correlated with underlying small-scale chromospheric bright points. A basic characterization of the morphology and identification of the presence of helical structure were established with respect to recently proposed models for their origin and temporal evolution. Though each jet appeared morphologically similar in the coronagraph field of view, in the sense of a narrow collimated outward flow of matter, at the source region in the low corona the jet showed different characteristics, which may correspond to different magnetic structures. A classification of the events with respect to previous jet studies shows that amongst the 79 events there were 37 Eiffel tower-type jet events, commonly interpreted as a small-scale (˜35 arc sec) magnetic bipole reconnecting with the ambient unipolar open coronal magnetic fields at its loop tops, and 12 lambda-type jet events commonly interpreted as reconnection with the ambient field happening at the bipole footpoints. Five events were termed micro-CME-type jet events because they resembled the classical coronal mass ejections (CMEs) but on much smaller scales. The remaining 25 cases could not be uniquely classified. Thirty-one of the total number of events exhibited a helical magnetic field structure, indicative for a torsional motion of the jet around its axis of propagation. A few jets are also found in equatorial coronal holes. In this study we present sample events for each of the jet types using both, STEREO A and STEREO B, perspectives. The typical lifetimes in the SECCHI/EUVI ( Extreme UltraViolet Imager) field of view between 1.0 to 1.7 R ⊙ and in SECCHI/COR1 field of view between 1.4 to 4 R ⊙ are obtained, and the derived speeds are roughly estimated. In summary, the observations support the assumption of continuous small-scale reconnection as an intrinsic feature of the solar corona, with its role for the heating of the corona, particle acceleration, structuring and acceleration of the solar wind remaining to be explored in more detail in further studies.

Up-conversion media on basis single crystals BaY2F8 for UV and VUV solid state lasers

NASA Astrophysics Data System (ADS)

Pushkar, A. A.; Ouvarova, T. V.; Molchanov, V. N.

2007-04-01

Crystal BaY IIF 8 represents the big interest as the perspective active media for lasers ultra-violet (UV) and vacuumultra- violet (VUV) regions. For the decision of problems with solarization this media and a choice of sources pump it is offered to use up-conversion mechanisms pump with activators from rare-earth elements (RE). We have developed technology of grown of oriented monocrystals BaY IIF 8, have defined influence of orientation on growth rate and quality ofthe received monocrystals.

Characterization and error analysis of an operational retrieval algorithm for estimating column ozone and aerosol properties from ground-based ultra-violet irradiance measurements

NASA Astrophysics Data System (ADS)

Taylor, Thomas E.; L'Ecuyer, Tristan; Slusser, James; Stephens, Graeme; Krotkov, Nick; Davis, John; Goering, Christian

2005-08-01

Extensive sensitivity and error characteristics of a recently developed optimal estimation retrieval algorithm which simultaneously determines aerosol optical depth (AOD), aerosol single scatter albedo (SSA) and total ozone column (TOC) from ultra-violet irradiances are described. The algorithm inverts measured diffuse and direct irradiances at 7 channels in the UV spectral range obtained from the United States Department of Agriculture's (USDA) UV-B Monitoring and Research Program's (UVMRP) network of 33 ground-based UV-MFRSR instruments to produce aerosol optical properties and TOC at all seven wavelengths. Sensitivity studies of the Tropospheric Ultra-violet/Visible (TUV) radiative transfer model performed for various operating modes (Delta-Eddington versus n-stream Discrete Ordinate) over domains of AOD, SSA, TOC, asymmetry parameter and surface albedo show that the solutions are well constrained. Realistic input error budgets and diagnostic and error outputs from the retrieval are analyzed to demonstrate the atmospheric conditions under which the retrieval provides useful and significant results. After optimizing the algorithm for the USDA site in Panther Junction, Texas the retrieval algorithm was run on a cloud screened set of irradiance measurements for the month of May 2003. Comparisons to independently derived AOD's are favorable with root mean square (RMS) differences of about 3% to 7% at 300nm and less than 1% at 368nm, on May 12 and 22, 2003. This retrieval method will be used to build an aerosol climatology and provide ground-truthing of satellite measurements by running it operationally on the USDA UV network database.

CHARACTERIZATION OF RELATIVE SENSITIVITY OF AMPHIBIANS TO ULTRA VIOLET RADIATION

EPA Science Inventory

Different studies have demonstrated that solar ultraviolet (UV) radiation can adversely affect survival and development of embryonic and larval amphibians. However, because of among-laboratory variations in exposure profiles (artificial vs. natural sunlight; natural sunlight at d...

Rapid Quantitative Analysis of Naringenin in the Fruit Bodies of Inonotus vaninii by Two-phase Acid Hydrolysis Followed by Reversed Phase-high Performance Liquid Chromatography-ultra Violet.

PubMed

Guohua, Xia; Pan, Ruirong; Bao, Rui; Ge, Yanru; Zhou, Cunshan; Shen, Yuping

2017-01-01

Sanghuang is one of mystical traditional Chinese medicines recorded earliest 2000 years ago, that included various fungi of Inonotus genus and was well-known for antitumor effect in modern medicine. Inonotus vaninii is grown in natural forest of Northeastern China merely and used as Sanghuang commercially, but it has no quality control specification until now. This study was to establish a rapid method of two-phase acid hydrolysis followed by reversed phase-high performance liquid chromatography-ultra violet (RP-HPLC-UV) to quantify naringenin in the fruit body of I. vaninii . Sample solution was prepared by pretreatment of raw material in two-phase acid hydrolysis and the hydrolysis technology was optimized. After reconstitution, analysis was performed using RP-HPLC-UV. The method validation was investigated and the naringenin content of sample and comparison were determined. The naringenin was obtained by two-phase acid hydrolysis method, namely, 10.0 g of raw material was hydrolyzed in 200 mL of 1% sulfuric acid aqueous solution (v/v) and 400 mL of chloroform in oil bath at 110°C for 2 h. Good linearity ( r = 0.9992) was achieved between concentration of analyte and peak area. The relative standard deviation (RSD) of precision was 2.47% and the RSD of naringenin contents for repeatability was 3.13%. The accuracy was supported with recoveries at 96.37%, 97.30%, and 99.31%. The sample solution prepared using the proposed method contained higher content of naringenin than conventional method and was stable for 8 h. Due to the high efficiency of sample preparation and high reliability of the HPLC method, it is feasible to use this method for routine analysis of naringenin in the fungus. A convenient two-phase acid hydrolysis was employed to produce naringenin from raw material, and then an efficient and reliable reversed phase-high performance liquid chromatography-ultra violet method was established to monitor naringenin in the fruit bodies of Inonotus vaninii . The newly established method could be used to control the quality of the herb. Abbreviations used: RP-HPLC-UV: Reversed Phase-High Performance Liquid Chromatography-Ultra Violet, RSD: Relative Standard Deviation, EtOAc: Ethyl acetate, ACN: Acetonitrile, MeOH: Methanol, RH: Relative Humility.

Progress in coherent lithography using table-top extreme ultraviolet lasers

NASA Astrophysics Data System (ADS)

Li, Wei

Nanotechnology has drawn a wide variety of attention as interesting phenomena occurs when the dimension of the structures is in the nanometer scale. The particular characteristics of nanoscale structures had enabled new applications in different fields in science and technology. Our capability to fabricate these nanostructures routinely for sure will impact the advancement of nanoscience. Apart from the high volume manufacturing in semiconductor industry, a small-scale but reliable nanofabrication tool can dramatically help the research in the field of nanotechnology. This dissertation describes alternative extreme ultraviolet (EUV) lithography techniques which combine table-top EUV laser and various cost-effective imaging strategies. For each technique, numerical simulations, system design, experiment result and its analysis will be presented. In chapter II, a brief review of the main characteristics of table-top EUV lasers will be addressed concentrating on its high power and large coherence radius that enable the lithography application described herein. The development of a Talbot EUV lithography system which is capable of printing 50nm half pitch nanopatterns will be illustrated in chapter III. A detailed discussion of its resolution limit will be presented followed by the development of X-Y-Z positioning stage, the fabrication protocol for diffractive EUV mask, and the pattern transfer using self- developed ion beam etching, and the dose control unit. In addition, this dissertation demonstrated the capability to fabricate functional periodic nanostructures using Talbot EUV lithography. After that, resolution enhancement techniques like multiple exposure, displacement Talbot EUV lithography, fractional Talbot EUV lithography, and Talbot lithography using 18.9nm amplified spontaneous emission laser will be demonstrated. Chapter IV will describe a hybrid EUV lithography which combines the Talbot imaging and interference lithography rendering a high resolution interference pattern whose lattice is modified by a custom designed Talbot mask. In other words, this method enables filling the arbitrary Talbot cell with ultra-fine interference nanofeatures. Detailed optics modeling, system design and experiment results using He-Ne laser and table top EUV laser are included. The last part of chapter IV will analyze its exclusive advantages over traditional Talbot or interference lithography.

Enhanced photocatalytic performance of CeO2-TiO2 nanocomposite for degradation of crystal violet dye and industrial waste effluent

NASA Astrophysics Data System (ADS)

Zahoor, Mehvish; Arshad, Amara; Khan, Yaqoob; Iqbal, Mazhar; Bajwa, Sadia Zafar; Soomro, Razium Ali; Ahmad, Ishaq; Butt, Faheem K.; Iqbal, M. Zubair; Wu, Aiguo; Khan, Waheed S.

2018-03-01

This study presents the synthesis of CeO2-TiO2 nanocomposite and its potential application for the visible light-driven photocatalytic degradation of model crystal violet dye as well as real industrial waste water. The ceria-titania (CeO2-TiO2) nanocomposite material was synthesised using facile hydrothermal route without the assistance of any template molecule. As-prepared composite was characterised by SEM, TEM, HRTEM, XRD, XPS for surface features, morphological and crystalline characters. The formed nanostructures were determined to possess crystal-like geometrical shape and average size less than 100 nm. The as-synthesised nanocomposite was further investigated for their heterogeneous photocatalytic potential against the oxidative degradation of CV dye taken as model pollutant. The photo-catalytic performance of the as-synthesised material was evaluated both under ultra-violet as well as visible light. Best photocatalytic performance was achieved under visible light with complete degradation (100%) exhibited within 60 min of irradiation time. The kinetics of the photocatalytic process were also considered and the reaction rate constant for CeO2-TiO2 nanocomposite was determined to be 0.0125 and 0.0662 min-1 for ultra-violet and visible region, respectively. In addition, the as-synthesised nanocomposite demonstrated promising results when considered for the photo-catalytic degradation of coloured industrial waste water collected from local textile industry situated in Faisalabad region of Pakistan. Enhanced photo-catalytic performance of CeO2-TiO2 nanocomposite was proposed owing to heterostructure formation leading to reduced electron-hole recombination.

FogEye UV Sensor System Performance Characteristics

DOT National Transportation Integrated Search

2004-03-01

The primary objective of the FogEye Evaluation Program is to determine whether coupled ultra-violet sources and detectors may provide enhancements to safety on the airport surface. The results of this effort will be used to complete the evaluation of...

Modelling the ionosphere of gas-giant exoplanets irradiated by low-mass stars

NASA Astrophysics Data System (ADS)

Chadney, J.; Galand, M.; Unruh, Y.; Koskinen, T.; Sanz-Forcada, J.

2015-10-01

The composition and structure of the upper atmosphere of Extrasolar Giant Planets (EGPs) are affected by the high-energy spectrum of the host star from soft X-rays to Extreme UltraViolet (EUV) (0.1-10 nm). This emission depends on the activity level of the star, which is primarily determined by its age [1]. In this study, we focus upon EGPs orbiting K- and M-dwarf stars of different ages. XUV spectra for these stars are constructed using a coronal model [2]. These spectra are used to drive both a thermospheric [3] and an ionospheric model, providing densities of neutral and ion species. Ionisation is included through photo-ionisation and electronimpact processes. The former is calculated by solving the Lambert-Beer law, while the latter is calculated from a supra-thermal electron transport model [4]. Planets orbiting far from the star are found to undergo Jeans escape, whereas close-orbiting planets undergo hydrodynamic escape. The critical orbital distance of transition between the two regimes is dependent on the level of stellar activity. We also find that EGP ionospheres at all orbital distances considered (0.1-1 AU) and around all stars selected (eps Eri, AD Leo, AU Mic) are dominated by the long-lived H+ ion. In addition, planets in the Jeans escape regime also have a layer in which H3 + is the major ion at the base of the ionosphere. For fast-rotating planets, densities of short-lived H3 + undergo significant diurnal variations, their peak value being determined by the stellar X-ray flux. In contrast, densities of longer-lived H+ show very little day/night variability and their value is determined by the level of stellar EUV flux. The H3 + peak in EGPs in the hydrodynamic escape regime under strong stellar illumination is pushed to altitudes below the homopause, where this ion is likely to be destroyed through reactions with heavy species (e.g., hydrocarbons, water). Infrared emissions from H3 + shall also be discussed, as well as the impact of stellar variability.

Toward compact and ultra-intense laser driven soft x-ray lasers (Conference Presentation)

NASA Astrophysics Data System (ADS)

Sebban, Stéphane

2017-05-01

We report here recent work on an optical-field ionized (OFI), high-order harmonic-seeded EUV laser. The amplifying medium is a plasma of nickel-like krypton obtained by optical field ionization focusing a 1 J, 30 fs, circularly- polarized, infrared pulse into a krypton-filled gas cell or krypton gas jet. The lasing transition is the 3d94p (J=0) --> 3d94p (J=1) transition of Ni-like krypton ions at 32.8 nm and is pumped by collisions with hot electrons. The polarization of the HH-seeded EUV laser beam was studied using an analyzer composed of three grazing incidence EUV multilayer mirrors able to spin under vacuum. For linear polarization, the Malus law has been recovered while in the case of a circularly-polarized seed, the EUV signal is insensitive to the rotation of the analyzer, bearing testimony to circularly polarized. The gain dynamics was probed by seeding the amplifier with a high-order harmonic pulse at different delays. The gain duration monotonically decreased from 7 ps to an unprecedented shortness of 450 fs FWHM as the amplification peak rose from 150 to 1,200 with an increase of the plasma density from 3 × 1018 cm-3 up to 1.2 × 1020 cm-3. The integrated energy of the EUV laser pulse was also measured, and found to be around 2 μJ. It is to be noted that in the ASE mode, longer amplifiers were achieved (up to 3 cm), yielding EUV outputs up to 14 μJ.

Remote sensing of soil moisture using airborne hyperspectral data

USDA-ARS?s Scientific Manuscript database

The Institute for Technology Development (ITD) has developed an airborne hyperspectral sensor system that collects electromagnetic reflectance data of the terrain. The system consists of sensors for three different sections of the electromagnetic spectrum; the Ultra-Violet (UV), Visible/Near Infrare...

FogEye UV Sensor System Evaluation : Phase II Report

DOT National Transportation Integrated Search

2003-12-01

The primary objective of the FogEye Evaluation Program is to determine whether coupled ultra-violet sources and detectors may provide enhancements to safety on the airport surface. The results of this effort will be used to complete the evaluation of...

40 CFR 63.987 - Flare requirements.

Code of Federal Regulations, 2013 CFR

2013-07-01

..., ultra-violet beam sensor, or infrared sensor) capable of continuously detecting that at least one pilot... millimeters of mercury (30 inches of mercury), but the standard temperature for determining the volume... cubic meter) (megajoules per kilocalories), where the standard temperature for gram mole per standard...

40 CFR 63.987 - Flare requirements.

Code of Federal Regulations, 2014 CFR

2014-07-01

..., ultra-violet beam sensor, or infrared sensor) capable of continuously detecting that at least one pilot... millimeters of mercury (30 inches of mercury), but the standard temperature for determining the volume... cubic meter) (megajoules per kilocalories), where the standard temperature for gram mole per standard...

40 CFR 63.987 - Flare requirements.

Code of Federal Regulations, 2012 CFR

2012-07-01

..., ultra-violet beam sensor, or infrared sensor) capable of continuously detecting that at least one pilot... millimeters of mercury (30 inches of mercury), but the standard temperature for determining the volume... cubic meter) (megajoules per kilocalories), where the standard temperature for gram mole per standard...

40 CFR 63.1415 - Monitoring requirements.

Code of Federal Regulations, 2013 CFR

2013-07-01

... thermocouple, ultra-violet beam sensor, or infrared sensor) capable of continuously detecting the presence of a... an absorber is used, a scrubbing liquid temperature monitoring device and a specific gravity... condenser exit temperature (product side) monitoring device equipped with a continuous recorder is required...

40 CFR 63.1415 - Monitoring requirements.

Code of Federal Regulations, 2014 CFR

2014-07-01

... thermocouple, ultra-violet beam sensor, or infrared sensor) capable of continuously detecting the presence of a... an absorber is used, a scrubbing liquid temperature monitoring device and a specific gravity... condenser exit temperature (product side) monitoring device equipped with a continuous recorder is required...

40 CFR 63.987 - Flare requirements.

Code of Federal Regulations, 2011 CFR

2011-07-01

..., ultra-violet beam sensor, or infrared sensor) capable of continuously detecting that at least one pilot... millimeters of mercury (30 inches of mercury), but the standard temperature for determining the volume... cubic meter) (megajoules per kilocalories), where the standard temperature for gram mole per standard...

40 CFR 63.1415 - Monitoring requirements.

Code of Federal Regulations, 2012 CFR

2012-07-01

... thermocouple, ultra-violet beam sensor, or infrared sensor) capable of continuously detecting the presence of a...) Where an absorber is used, a scrubbing liquid temperature monitoring device and a specific gravity... condenser exit temperature (product side) monitoring device equipped with a continuous recorder is required...

40 CFR 1065.1010 - Reference materials.

Code of Federal Regulations, 2010 CFR

2010-07-01

... § 1065.1010—Institute of Petroleum Materials Document No. and name Part 1065 reference IP-470... atomic absorption spectrometry 1065.705 IP-500, Determination of the phosphorus content of residual fuels by ultra-violet spectrometry 1065.705 IP-501, Determination of aluminum, silicon, vanadium, nickel...

Characterization of the global structure of low methoxyl pectin in solution

USDA-ARS?s Scientific Manuscript database

Low methoxyl citrus pectin (LMP) and amidated low methoxyl pectin (LMAP) were characterized by high performance size exclusion chromatography (HPSEC) with online light scattering (LS), intrinsic viscosity ('w), differential refractive index (dRI) and ultra violet detection (UV), by amino acid anal...

From Radio to X-rays--Some 'Real' Electrical Applications.

ERIC Educational Resources Information Center

Freeman, J. C.

1986-01-01

Describes practical applications related to X-rays, ultra-violet radiation, light radiation, short-wave infra-red radiation, medium-wave infra-red radiation, long-wave infra-red radiation, microwave radiation, and radio frequency radiation. Suggests that these applications be used during instruction on electricity. (JN)

NIR emitting K2SrCl4:Eu2+, Nd3+ phosphor as a spectral converter for CIGS solar cell

NASA Astrophysics Data System (ADS)

Tawalare, P. K.; Bhatkar, V. B.; Omanwar, S. K.; Moharil, S. V.

2018-05-01

Intense near-infrared emitting phosphor K2SrCl4:Eu2+,Nd3+ with various concentrations of Nd3+ were synthesized. These are characterized with X-ray diffraction, reflectance, photoluminescence emission and photoluminescence excitation spectroscopy, PL lifetime measurements. The emission can be excited by a broad band in near ultra violet region as a consequence of Eu2+→Nd3+ energy transfer. The efficiency of Eu2+→Nd3+ energy transfer is as high as 95%. Fluorescence decay curves for Eu2+ doped samples are almost exponential and described by τ = 500 ns. Eu2+ lifetimes are shortened after Nd3+ doping. Near infrared Emission intensity is limited by Nd3+→Nd3+ energy transfer and the consequent concentration quenching. Nd3+ emission matches well with the spectral response of CIGS and CIS solar cells. Absorption of near ultra violet radiations followed by conversion to near infrared indicates the potential application in solar photovoltaics.

Ultra-thin layer chromatography and surface enhanced Raman spectroscopy on silver nanorod array substrates prepared by oblique angle deposition

NASA Astrophysics Data System (ADS)

Chen, Jing; Abell, Justin; Huang, Yao-wen; Zhao, Yiping

2012-06-01

We demonstrate the potential use of silver nanorod (AgNR) array substrates for on-chip separation and detection of chemical mixtures by ultra-thin layer chromatography (UTLC) and surface enhanced Raman spectroscopy (SERS). The capability of the AgNR substrates to separate different compounds in a mixture was explored using a mixture of the food colorant Brilliant Blue FCF and lactic acid, and the mixtures of Methylene Violet and BSA at various concentrations. After the UTLC process, spatially-resolved SERS spectra were collected along the mobile phase development direction and the intensities of specific SERS peaks from each component were used to generate chromatograms. The AgNR substrates demonstrate the capability of separating Brilliant Blue from lactic acid, as well as revealing the SERS signal of Methylene Violet from the massive BSA background after a simple UTLC step. This technique may have significant practical implications in actual detection of small molecules from complex food or clinical backgrounds.

Ultra-violet absorption induced modifications in bulk and nanoscale electrical transport properties of Al-doped ZnO thin films

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kumar, Mohit; Basu, Tanmoy; Som, Tapobrata, E-mail: tsom@iopb.res.in

Using conductive atomic force microscopy and Kelvin probe force microscopy, we study local electrical transport properties in aluminum-doped zinc oxide (ZnO:Al or AZO) thin films. Current mapping shows a spatial variation in conductivity which corroborates well with the local mapping of donor concentration (∼10{sup 20 }cm{sup −3}). In addition, a strong enhancement in the local current at grains is observed after exposing the film to ultra-violet (UV) light which is attributed to persistent photocurrent. Further, it is shown that UV absorption gives a smooth conduction in AZO film which in turn gives rise to an improvement in the bulk photoresponsivity ofmore » an n-AZO/p-Si heterojunction diode. This finding is in contrast to the belief that UV absorption in an AZO layer leads to an optical loss for the underneath absorbing layer of a heterojunction solar cell.« less

Light absorption of organic aerosol from pyrolysis of corn stalk

NASA Astrophysics Data System (ADS)

Li, Xinghua; Chen, Yanju; Bond, Tami C.

2016-11-01

Organic aerosol (OA) can absorb solar radiation in the low-visible and ultra-violet wavelengths thereby modifying radiative forcing. Agricultural waste burning emits a large quantity of organic carbon in many developing countries. In this work, we improved the extraction and analysis method developed by Chen and Bond, and extended the spectral range of OC absorption. We examined light absorbing properties of primary OA from pyrolysis of corn stalk, which is a major type of agricultural wastes. Light absorption of bulk liquid extracts of OA was measured using a UV-vis recording spectrophotometer. OA can be extracted by methanol at 95%, close to full extent, and shows polar character. Light absorption of organic aerosol has strong spectral dependence (Absorption Ångström exponent = 7.7) and is not negligible at ultra-violet and low-visible regions. Higher pyrolysis temperature produced OA with higher absorption. Imaginary refractive index of organic aerosol (kOA) is 0.041 at 400 nm wavelength and 0.005 at 550 nm wavelength, respectively.

Near-infrared photoluminescence in La0.98AlO3: 0.02Ln3+(Ln = Nd/Yb) for sensitization of c-Si solar cells

NASA Astrophysics Data System (ADS)

Sawala, N. S.; Koparkar, K. A.; Bajaj, N. S.; Omanwar, S. K.

2016-05-01

The host matrix LaAlO3 was synthesized by conventional solid state reaction method in which the Nd3+ ions and Yb3+ ions successfully doped at 2mol% concentrations. The phase purity was confirmed by X ray powder diffraction (XRD) method. The photoluminescence (PL) properties were studied by spectrophotometer in near infra red (NIR) and ultra violet visible (UV-VIS) region. The Nd3+ ion doped LaAlO3 converts a visible (VIS) green photon (587 nm) into near infrared (NIR) photon (1070 nm) while Yb3+ ion doped converts ultra violet (UV) photon (221 nm) into NIR photon (980 nm). The La0.98AlO3: 0.02Ln3+(Ln = Nd / Yb) can be potentiality used for betterment of photovoltaic (PV) technology. This result further indicates its potential application as a luminescence converter layer for enhancing solar cells performance.

The effects of welding parameters on ultra-violet light emissions, ozone and CrVI formation in MIG welding.

PubMed

Dennis, J H; Mortazavi, S B; French, M J; Hewitt, P J; Redding, C R

1997-01-01

This paper describes the relationships between ultra-violet emission, ozone generation and CrVI production in MIG welding which were measured as a function of shield gas flow rate, welding voltage, electrode stick-out and shield gas composition using an automatic welding rig that permitted MIG welding under reproducible conditions. The experimental results are interpreted in terms of the physico-chemical processes occurring in the micro- and macro-environments of the arc as part of research into process modification to reduce occupational exposure to ozone and CrVI production rates in MIG welding. We believe the techniques described here, and in particular the use of what we have termed u.v.-ozone measurements, will prove useful in further study of ozone generation and CrVI formation and may be applied in the investigation of engineering control of occupational exposure in MIG and other welding process such as Manual Metal Arc (MMA) and Tungsten Inert Gas (TIG).

Ultra-short wavelength x-ray system

DOEpatents

Umstadter, Donald [Ann Arbor, MI; He, Fei [Ann Arbor, MI; Lau, Yue-Ying [Potomac, MD

2008-01-22

A method and apparatus to generate a beam of coherent light including x-rays or XUV by colliding a high-intensity laser pulse with an electron beam that is accelerated by a synchronized laser pulse. Applications include x-ray and EUV lithography, protein structural analysis, plasma diagnostics, x-ray diffraction, crack analysis, non-destructive testing, surface science and ultrafast science.

30 CFR 50.20-6 - Criteria-MSHA Form 7000-1, Section C.

Code of Federal Regulations, 2011 CFR

2011-07-01

... daughters, non-medical, non-therapeutic X-rays, radium); effects of nonionizing radiation (welding flash, ultra-violet rays, micro-waves, sunburn). (vi) Code 26—Disorders Associated with Repeated Trauma...). Examples: Poisoning by lead, mercury, cadmium, arsenic, or other metals, poisoning by carbon monoxide...

75 FR 32754 - Certain New Chemicals; Receipt and Status Information

Federal Register 2010, 2011, 2012, 2013, 2014

2010-06-09

... are required to show photographic identification, pass through a metal detector, and sign the EPA visitor log. All visitor bags are processed through an X-ray machine and subject to search. Visitors will...; ultra hydroxyethyl ester, violet curable metal reaction products coatings with dicyclopentadiene, 5...

40 CFR 63.1429 - Process vent monitoring requirements.

Code of Federal Regulations, 2010 CFR

2010-07-01

... thermocouple, ultra-violet beam sensor, or infrared sensor) capable of continuously detecting the presence of a... used, a temperature monitoring device equipped with a continuous recorder is required. (i) Where an incinerator other than a catalytic incinerator is used, a temperature monitoring device shall be installed in...

40 CFR 63.1429 - Process vent monitoring requirements.

Code of Federal Regulations, 2012 CFR

2012-07-01

... thermocouple, ultra-violet beam sensor, or infrared sensor) capable of continuously detecting the presence of a... used, a temperature monitoring device equipped with a continuous recorder is required. (i) Where an incinerator other than a catalytic incinerator is used, a temperature monitoring device shall be installed in...

40 CFR 63.1324 - Batch process vents-monitoring equipment.

Code of Federal Regulations, 2012 CFR

2012-07-01

... device (including but not limited to a thermocouple, ultra-violet beam sensor, or infrared sensor... temperature monitoring device equipped with a continuous recorder is required. (i) Where an incinerator other than a catalytic incinerator is used, the temperature monitoring device shall be installed in the...

40 CFR 63.114 - Process vent provisions-monitoring requirements.

Code of Federal Regulations, 2014 CFR

2014-07-01

... but not limited to a thermocouple, ultra-violet beam sensor, or infrared sensor) capable of... accurately. (1) Where an incinerator is used, a temperature monitoring device equipped with a continuous recorder is required. (i) Where an incinerator other than a catalytic incinerator is used, a temperature...

40 CFR 63.1429 - Process vent monitoring requirements.

Code of Federal Regulations, 2011 CFR

2011-07-01

... thermocouple, ultra-violet beam sensor, or infrared sensor) capable of continuously detecting the presence of a... used, a temperature monitoring device equipped with a continuous recorder is required. (i) Where an incinerator other than a catalytic incinerator is used, a temperature monitoring device shall be installed in...

40 CFR 63.114 - Process vent provisions-monitoring requirements.

Code of Federal Regulations, 2012 CFR

2012-07-01

... but not limited to a thermocouple, ultra-violet beam sensor, or infrared sensor) capable of... accurately. (1) Where an incinerator is used, a temperature monitoring device equipped with a continuous recorder is required. (i) Where an incinerator other than a catalytic incinerator is used, a temperature...

40 CFR 63.114 - Process vent provisions-monitoring requirements.

Code of Federal Regulations, 2013 CFR

2013-07-01

... but not limited to a thermocouple, ultra-violet beam sensor, or infrared sensor) capable of... accurately. (1) Where an incinerator is used, a temperature monitoring device equipped with a continuous recorder is required. (i) Where an incinerator other than a catalytic incinerator is used, a temperature...

Polydiacetylenes: An Ideal Color System for Teaching Polymer Science.

ERIC Educational Resources Information Center

Patel, Gordhan N.; Yang, Nan-Loh

1983-01-01

Describes 14 experiments that illustrate, via color changes, a broad scope of fundamental phenomena in polymer science. The experiments, suitable for high school through graduate level, require only test tubes, filter paper, heat source (hot plate or hair drier), and ultra-violet light source. (JN)

EUV microexposures at the ALS using the 0.3-NA MET projectionoptics

DOE Office of Scientific and Technical Information (OSTI.GOV)

Naulleau, Patrick; Goldberg, Kenneth A.; Anderson, Erik

2005-09-01

The recent development of high numerical aperture (NA) EUV optics such as the 0.3-NA Micro Exposure Tool (MET) optic has given rise to a new class of ultra-high resolution microexposure stations. Once such printing station has been developed and implemented at Lawrence Berkeley National Laboratory's Advanced Light Source. This flexible printing station utilizes a programmable coherence illuminator providing real-time pupil-fill control for advanced EUV resist and mask development. The Berkeley exposure system programmable illuminator enables several unique capabilities. Using dipole illumination out to {sigma}=1, the Berkeley tool supports equal-line-space printing down to 12 nm, well beyond the capabilities of similarmore » tools. Using small-sigma illumination combined with the central obscuration of the MET optic enables the system to print feature sizes that are twice as small as those coded on the mask. In this configuration, the effective 10x-demagnification for equal lines and spaces reduces the mask fabrication burden for ultra-high-resolution printing. The illuminator facilitates coherence studies such as the impact of coherence on line-edge roughness (LER) and flare. Finally the illuminator enables novel print-based aberration monitoring techniques as described elsewhere in these proceedings. Here we describe the capabilities of the new MET printing station and present system characterization results. Moreover, we present the latest printing results obtained in experimental resists. Limited by the availability of high-resolution photoresists, equal line-space printing down to 25 nm has been demonstrated as well as isolated line printing down to 29 nm with an LER of approaching 3 nm.« less

The effect of ultra-violet light curing on the molecular structure and fracture properties of an ultra low-k material

NASA Astrophysics Data System (ADS)

Smith, Ryan Scott

As the gate density increases in microelectronic devices, the interconnect delay or RC response also increases and has become the limiting delay to faster devices. In order to decrease the RC time delay, a new metallization scheme has been chosen by the semiconductor industry. Copper has replaced aluminum as the metal lines and new low-k dielectric materials are being developed to replace silicon dioxide. A promising low-k material is porous organosilicate glass or p-OSG. The p-OSG film is a hybrid material where the silicon dioxide backbone is terminated with methyl or hydrogen, reducing the dielectric constant and creating mechanically weak films that are prone to fracture. A few methods of improving the mechanical properties of p-OSG films have been attempted-- exposing the film to hydrogen plasma, electron beam curing, and ultra-violet light curing. Hydrogen plasma and electron-beam curing suffer from a lack of specificity and can cause charging damage to the gates. Therefore, ultra-violet light curing (UV curing) is preferable. The effect of UV curing on an ultra-low-k, k~2.5, p-OSG film is studied in this dissertation. Changes in the molecular structure were measured with Fourier Transform Infrared Spectroscopy and X-ray Photoelectron Spectroscopy. The evolution of the molecular structure with UV curing was correlated with material and fracture properties. The material properties were film shrinkage, densification, and an increase in dielectric constant. From the changes in molecular structure and material properties, a set of condensation reactions with UV light are predicted. The connectivity of the film increases with the condensation reactions and, therefore, the fracture toughness should also increase. The effect of UV curing on the critical and sub-critical fracture toughness was also studied. The critical fracture toughness was measured at four different mode-mixes-- zero, 15°, 32°, and 42°. It was found that the critical fracture toughness increases with UV exposure for all mode mixes. The sub-critical fracture toughness was measured in Mode I and found to be insensitive to UV cure. A simple reaction rate model is used to explain the difference in critical and sub-critical fracture toughness.

State-of-the-art EUV materials and processes for the 7nm node and beyond

NASA Astrophysics Data System (ADS)

Buitrago, Elizabeth; Meeuwissen, Marieke; Yildirim, Oktay; Custers, Rolf; Hoefnagels, Rik; Rispens, Gijsbert; Vockenhuber, Michaela; Mochi, Iacopo; Fallica, Roberto; Tasdemir, Zuhal; Ekinci, Yasin

2017-03-01

Extreme ultraviolet lithography (EUVL, λ = 13.5 nm) being the most likely candidate to manufacture electronic devices for future technology nodes is to be introduced in high volume manufacturing (HVM) at the 7 nm logic node, at least at critical lithography levels. With this impending introduction, it is clear that excellent resist performance at ultra-high printing resolutions (below 20 nm line/space L/S) is ever more pressing. Nonetheless, EUVL has faced many technical challenges towards this paradigm shift to a new lithography wavelength platform. Since the inception of chemically amplified resists (CARs) they have been the base upon which state-of-the art photoresist technology has been developed from. Resist performance as measured in terms of printing resolution (R), line edge roughness (LER), sensitivity (D or exposure dose) and exposure latitude (EL) needs to be improved but there are well known trade-off relationships (LRS trade-off) among these parameters for CARs that hamper their simultaneous enhancement. Here, we present some of the most promising EUVL materials tested by EUV interference lithography (EUV-IL) with the aim of resolving features down to 11 nm half-pitch (HP), while focusing on resist performance at 16 and 13 nm HP as needed for the 7 and 5 nm node, respectively. EUV-IL has enabled the characterization and development of new resist materials before commercial EUV exposure tools become available and is therefore a powerful research and development tool. With EUV-IL, highresolution periodic images can be printed by the interference of two or more spatially coherent beams through a transmission-diffraction grating mask. For this reason, our experiments have been performed by EUV-IL at Swiss Light Source (SLS) synchrotron facility located at the Paul Scherrer Institute (PSI). Having the opportunity to test hundreds of EUVL materials from vendors and research partners from all over the world, PSI is able to give a global update on some of the most promising materials tested.

40 CFR 63.987 - Flare requirements.

Code of Federal Regulations, 2010 CFR

2010-07-01

... Emission Standards for Closed Vent Systems, Control Devices, Recovery Devices and Routing to a Fuel Gas... the additional cycles. (ii) The net heating value of the gas being combusted in a flare shall be..., ultra-violet beam sensor, or infrared sensor) capable of continuously detecting that at least one pilot...

40 CFR 63.1324 - Batch process vents-monitoring equipment.

Code of Federal Regulations, 2011 CFR

2011-07-01

... installed in the gas stream immediately before and after the catalyst bed. (2) Where a flare is used, a device (including but not limited to a thermocouple, ultra-violet beam sensor, or infrared sensor... scrubber influent for liquid flow. Gas stream flow shall be determined using one of the procedures...

40 CFR 63.1324 - Batch process vents-monitoring equipment.

Code of Federal Regulations, 2010 CFR

2010-07-01

... installed in the gas stream immediately before and after the catalyst bed. (2) Where a flare is used, a device (including but not limited to a thermocouple, ultra-violet beam sensor, or infrared sensor... scrubber influent for liquid flow. Gas stream flow shall be determined using one of the procedures...

40 CFR 63.114 - Process vent provisions-monitoring requirements.

Code of Federal Regulations, 2010 CFR

2010-07-01

..., temperature monitoring devices shall be installed in the gas stream immediately before and after the catalyst... but not limited to a thermocouple, ultra-violet beam sensor, or infrared sensor) capable of... monitoring device in the firebox equipped with a continuous recorder. This requirement does not apply to gas...

40 CFR 63.114 - Process vent provisions-monitoring requirements.

Code of Federal Regulations, 2011 CFR

2011-07-01

..., temperature monitoring devices shall be installed in the gas stream immediately before and after the catalyst... but not limited to a thermocouple, ultra-violet beam sensor, or infrared sensor) capable of... monitoring device in the firebox equipped with a continuous recorder. This requirement does not apply to gas...

The LUVOIR Mission Concept: Update and Technology Overview

NASA Technical Reports Server (NTRS)

Bolcar, Matthew R.

2016-01-01

We present an overview of the Large Ultra Violet Optical Infrared (LUVOIR) decadal mission concept study. We provide updates from recent activities of the Science and Technology Definition Team (STDT) and the Technology Working Group (TWG). We review the technology prioritization and discuss specific technology needs to enable the LUVOIR mission.

Hexaammine Complexes of Cr(III) and Co(III): A Spectral Study.

ERIC Educational Resources Information Center

Brown, D. R.; Pavlis, R. R.

1985-01-01

Procedures are provided for experiments containing complex ions with octahedral symmetry, hexaamminecobalt(III) chloride and hexaamminechromium(III) nitrate, so students can interpret fully the ultra violet/visible spectra of the complex cations in terms of the ligand field parameters, 10 "Dq," the Racah interelectron repulsion parameters, "B,"…

40 CFR 63.489 - Batch front-end process vents-monitoring equipment.

Code of Federal Regulations, 2013 CFR

2013-07-01

... device (including, but not limited to, a thermocouple, ultra-violet beam sensor, or infrared sensor... temperature monitoring device equipped with a continuous recorder is required. (i) Where an incinerator other than a catalytic incinerator is used, the temperature monitoring device shall be installed in the...

40 CFR 63.127 - Transfer operations provisions-monitoring requirements.

Code of Federal Regulations, 2013 CFR

2013-07-01

... device (including but not limited to a thermocouple, infrared sensor, or an ultra-violet beam sensor... temperature monitoring device equipped with a continuous recorder is required. (i) Where an incinerator other than a catalytic incinerator is used, a temperature monitoring device shall be installed in the firebox...

40 CFR 63.489 - Batch front-end process vents-monitoring equipment.

Code of Federal Regulations, 2012 CFR

2012-07-01

... device (including, but not limited to, a thermocouple, ultra-violet beam sensor, or infrared sensor... temperature monitoring device equipped with a continuous recorder is required. (i) Where an incinerator other than a catalytic incinerator is used, the temperature monitoring device shall be installed in the...

40 CFR 63.127 - Transfer operations provisions-monitoring requirements.

Code of Federal Regulations, 2014 CFR

2014-07-01

... device (including but not limited to a thermocouple, infrared sensor, or an ultra-violet beam sensor... temperature monitoring device equipped with a continuous recorder is required. (i) Where an incinerator other than a catalytic incinerator is used, a temperature monitoring device shall be installed in the firebox...

40 CFR 63.489 - Batch front-end process vents-monitoring equipment.

Code of Federal Regulations, 2014 CFR

2014-07-01

... device (including, but not limited to, a thermocouple, ultra-violet beam sensor, or infrared sensor... temperature monitoring device equipped with a continuous recorder is required. (i) Where an incinerator other than a catalytic incinerator is used, the temperature monitoring device shall be installed in the...

40 CFR 63.127 - Transfer operations provisions-monitoring requirements.

Code of Federal Regulations, 2012 CFR

2012-07-01

... device (including but not limited to a thermocouple, infrared sensor, or an ultra-violet beam sensor... temperature monitoring device equipped with a continuous recorder is required. (i) Where an incinerator other than a catalytic incinerator is used, a temperature monitoring device shall be installed in the firebox...

Tunable, rare earth-doped solid state lasers

DOEpatents

Emmett, John L.; Jacobs, Ralph R.; Krupke, William F.; Weber, Marvin J.

1980-01-01

Laser apparatus comprising combinations of an excimer pump laser and a rare earth-doped solid matrix, utilizing the 5d-4f radiative transition in a rare earth ion to produce visible and ultra-violet laser radiation with high overall efficiency in selected cases and relatively long radiative lifetimes.

Sub-50 nm metrology on extreme ultra violet chemically amplified resist—A systematic assessment

DOE Office of Scientific and Technical Information (OSTI.GOV)

Maas, D. J., E-mail: diederik.maas@tno.nl; Herfst, R.; Veldhoven, E. van

2015-10-15

With lithographic patterning dimensions decreasing well below 50 nm, it is of high importance to understand metrology at such small scales. This paper presents results obtained from dense arrays of contact holes (CHs) with various Critical Dimension (CD) between 15 and 50 nm, as patterned in a chemically amplified resist using an ASML EUV scanner and measured at ASML and TNO. To determine the differences between various (local) CD metrology techniques, we conducted an experiment using optical scatterometry, CD-Scanning Electron Microscopy (CD-SEM), Helium ion Microscopy (HIM), and Atomic Force Microscopy (AFM). CD-SEM requires advanced beam scan strategies to mitigate samplemore » charging; the other tools did not need that. We discuss the observed main similarities and differences between the various techniques. To this end, we assessed the spatial frequency content in the raw images for SEM, HIM, and AFM. HIM and AFM resolve the highest spatial frequencies, which are attributed to the more localized probe-sample interaction for these techniques. Furthermore, the SEM, HIM, and AFM waveforms are analyzed in detail. All techniques show good mutual correlation, albeit the reported CD values systematically differ significantly. HIM systematically reports a 25% higher CD uniformity number than CD-SEM for the same arrays of CHs, probably because HIM has a higher resolution than the CD-SEM used in this assessment. A significant speed boost for HIM and AFM is required before these techniques are to serve the demanding industrial metrology applications like optical critical dimension and CD-SEM do nowadays.« less

Line roughness improvements on self-aligned quadruple patterning by wafer stress engineering

NASA Astrophysics Data System (ADS)

Liu, Eric; Ko, Akiteru; Biolsi, Peter; Chae, Soo Doo; Hsieh, Chia-Yun; Kagaya, Munehito; Lee, Choongman; Moriya, Tsuyoshi; Tsujikawa, Shimpei; Suzuki, Yusuke; Okubo, Kazuya; Imai, Kiyotaka

2018-04-01

In integrated circuit and memory devices, size shrinkage has been the most effective method to reduce production cost and enable the steady increment of the number of transistors per unit area over the past few decades. In order to reduce the die size and feature size, it is necessary to minimize pattern formation in the advance node development. In the node of sub-10nm, extreme ultra violet lithography (EUV) and multi-patterning solutions based on 193nm immersionlithography are the two most common options to achieve the size requirement. In such small features of line and space pattern, line width roughness (LWR) and line edge roughness (LER) contribute significant amount of process variation that impacts both physical and electrical performances. In this paper, we focus on optimizing the line roughness performance by using wafer stress engineering on 30nm pitch line and space pattern. This pattern is generated by a self-aligned quadruple patterning (SAQP) technique for the potential application of fin formation. Our investigation starts by comparing film materials and stress levels in various processing steps and material selection on SAQP integration scheme. From the cross-matrix comparison, we are able to determine the best stack of film selection and stress combination in order to achieve the lowest line roughness performance while obtaining pattern validity after fin etch. This stack is also used to study the step-by-step line roughness performance from SAQP to fin etch. Finally, we will show a successful patterning of 30nm pitch line and space pattern SAQP scheme with 1nm line roughness performance.

Sub-50 nm metrology on extreme ultra violet chemically amplified resist—A systematic assessment

NASA Astrophysics Data System (ADS)

Maas, D. J.; Fliervoet, T.; Herfst, R.; van Veldhoven, E.; Meessen, J.; Vaenkatesan, V.; Sadeghian, H.

2015-10-01

With lithographic patterning dimensions decreasing well below 50 nm, it is of high importance to understand metrology at such small scales. This paper presents results obtained from dense arrays of contact holes (CHs) with various Critical Dimension (CD) between 15 and 50 nm, as patterned in a chemically amplified resist using an ASML EUV scanner and measured at ASML and TNO. To determine the differences between various (local) CD metrology techniques, we conducted an experiment using optical scatterometry, CD-Scanning Electron Microscopy (CD-SEM), Helium ion Microscopy (HIM), and Atomic Force Microscopy (AFM). CD-SEM requires advanced beam scan strategies to mitigate sample charging; the other tools did not need that. We discuss the observed main similarities and differences between the various techniques. To this end, we assessed the spatial frequency content in the raw images for SEM, HIM, and AFM. HIM and AFM resolve the highest spatial frequencies, which are attributed to the more localized probe-sample interaction for these techniques. Furthermore, the SEM, HIM, and AFM waveforms are analyzed in detail. All techniques show good mutual correlation, albeit the reported CD values systematically differ significantly. HIM systematically reports a 25% higher CD uniformity number than CD-SEM for the same arrays of CHs, probably because HIM has a higher resolution than the CD-SEM used in this assessment. A significant speed boost for HIM and AFM is required before these techniques are to serve the demanding industrial metrology applications like optical critical dimension and CD-SEM do nowadays.

Flux Cancelation: The Key to Solar Eruptions

NASA Technical Reports Server (NTRS)

Panesar, Navdeep K.; Sterling, Alphonse; Moore, Ronald; Chakrapani, Prithi; Innes, Davina; Schmit, Don; Tiwari, Sanjiv

2017-01-01

Solar coronal jets are magnetically channeled eruptions that occur in all types of solar environments (e.g. active regions, quiet-Sun regions and coronal holes). Recent studies show that coronal jets are driven by the eruption of small-scare filaments (minifilaments). Once the eruption is underway magnetic reconnection evidently makes the jet spire and the bright emission in the jet base. However, the triggering mechanism of these eruptions and the formation mechanism of the pre-jet minifilaments are still open questions. In this talk, mainly using SDO/AIA (Solar Dynamics Observatory / Atmospheric Imaging Assembly) and SDO/HIM (Solar Dynamics Observatory / Helioseismic and Magnetic Imager) data, first I will address the question: what triggers the jet-driving minifilament eruptions in different solar environments (coronal holes, quiet regions, active regions)? Then I will talk about the magnetic field evolution that produces the pre-jet minifilaments. By examining pre-jet evolutionary changes in line-of-sight HMI magnetograms while examining concurrent EUV (Extreme Ultra-Violet) images of coronal and transition-region emission, we find clear evidence that flux cancelation is the main process that builds pre-jet minifilaments, and is also the main process that triggers the eruptions. I will also present results from our ongoing work indicating that jet-driving minifilament eruptions are analogous to larger-scare filament eruptions that make flares and CMEs (Coronal Mass Ejections). We find that persistent flux cancellation at the neutral line of large-scale filaments often triggers their eruptions. From our observations we infer that flux cancelation is the fundamental process from the buildup and triggering of solar eruptions of all sizes.

UV Radiation Damage and Bacterial DNA Repair Systems

ERIC Educational Resources Information Center

Zion, Michal; Guy, Daniel; Yarom, Ruth; Slesak, Michaela

2006-01-01

This paper reports on a simple hands-on laboratory procedure for high school students in studying both radiation damage and DNA repair systems in bacteria. The sensitivity to ultra-violet (UV) radiation of both "Escherichia coli" and "Serratia marcescens" is tested by radiating them for varying time periods. Two growth temperatures are used in…

OH SENSOR BASED ON ULTRA-VIOLET, CONTINUOUS-WAVE ABSORPTION SPECTROSCOPY UTILIZING A FREQUENCY-QUADRUPLED, FIBER-AMPLIFIED EXTERNAL CAVITY DIODE LASER. (R828180)

EPA Science Inventory

The perspectives, information and conclusions conveyed in research project abstracts, progress reports, final reports, journal abstracts and journal publications convey the viewpoints of the principal investigator and may not represent the views and policies of ORD and EPA. Concl...

40 CFR 63.127 - Transfer operations provisions-monitoring requirements.

Code of Federal Regulations, 2010 CFR

2010-07-01

... installed in the gas stream immediately before and after the catalyst bed. (2) Where a flare is used, a device (including but not limited to a thermocouple, infrared sensor, or an ultra-violet beam sensor... scrubber influent for liquid flow. Gas stream flow shall be determined using one of the procedures...

40 CFR 63.489 - Batch front-end process vents-monitoring equipment.

Code of Federal Regulations, 2011 CFR

2011-07-01

... installed in the gas stream immediately before and after the catalyst bed. (2) Where a flare is used, a device (including, but not limited to, a thermocouple, ultra-violet beam sensor, or infrared sensor... at the scrubber influent for liquid flow. Gas stream flow shall be determined using one of the...

40 CFR 63.127 - Transfer operations provisions-monitoring requirements.

Code of Federal Regulations, 2011 CFR

2011-07-01

... installed in the gas stream immediately before and after the catalyst bed. (2) Where a flare is used, a device (including but not limited to a thermocouple, infrared sensor, or an ultra-violet beam sensor... scrubber influent for liquid flow. Gas stream flow shall be determined using one of the procedures...

40 CFR 63.489 - Batch front-end process vents-monitoring equipment.

Code of Federal Regulations, 2010 CFR

2010-07-01

... installed in the gas stream immediately before and after the catalyst bed. (2) Where a flare is used, a device (including, but not limited to, a thermocouple, ultra-violet beam sensor, or infrared sensor... at the scrubber influent for liquid flow. Gas stream flow shall be determined using one of the...

Colour and Light Effects on Students' Achievement, Behavior and Physiology.

ERIC Educational Resources Information Center

Wohlfarth, H.

A quasi-experimental non-equivalent control group design was used to investigate the effects of full-spectrum light, prescribed color and light/color combinations, ultra-violet light, and electromagnetic radiation in an elementary school environment. Four schools in the Wetaskiwin School District, Alberta, were involved in the study; three served…

Infiltration Kinetics and Interfacial Bond Strength of Metal Matrix Composites

DTIC Science & Technology

1992-07-01

and M. Kohyama [29] used X-ray and ultra violet photoelectron spectroscopy to monitor the in situ electronic structure changes of the alumina surface...in terms of Gibbs excess energy, G". Therefore, AGUa A- A GR Gx- (3) The procedure established to estimate GX" involves the use of the experimentally

TITANIUM DIOXIDE AND ULTRA-VIOLET LIGHT: A SUSTAINABLE AND INEXPENSIVE SOLUTION FOR ADDRESSING DRINKING WATER QUALITY ISSUES IN THE DEVELOPING COUNTRIES

EPA Science Inventory

The Ti0₂ based purification system reactor was built and tested by various diagnostic techniques for its efficacy in detoxification of water against organic and biological matter. Initial experiments were done with ultraviolet lamp as ...

Near-infrared photoluminescence in La{sub 0.98}AlO{sub 3}: {sub 0.02}Ln{sup 3+}(Ln = Nd/Yb) for sensitization of c-Si solar cells

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sawala, N. S., E-mail: nssawala@gmail.com; Koparkar, K. A.; Omanwar, S. K.

2016-05-06

The host matrix LaAlO{sub 3} was synthesized by conventional solid state reaction method in which the Nd{sup 3+} ions and Yb{sup 3+} ions successfully doped at 2mol% concentrations. The phase purity was confirmed by X ray powder diffraction (XRD) method. The photoluminescence (PL) properties were studied by spectrophotometer in near infra red (NIR) and ultra violet visible (UV-VIS) region. The Nd{sup 3+} ion doped LaAlO{sub 3} converts a visible (VIS) green photon (587 nm) into near infrared (NIR) photon (1070 nm) while Yb{sup 3+} ion doped converts ultra violet (UV) photon (221 nm) into NIR photon (980 nm). The La{sub 0.98}AlO{sub 3}: {sub 0.02}Ln{supmore » 3+}(Ln = Nd / Yb) can be potentiality used for betterment of photovoltaic (PV) technology. This result further indicates its potential application as a luminescence converter layer for enhancing solar cells performance.« less

The Far Ultra-Violet Imager on the Icon Mission

NASA Astrophysics Data System (ADS)

Mende, S. B.; Frey, H. U.; Rider, K.; Chou, C.; Harris, S. E.; Siegmund, O. H. W.; England, S. L.; Wilkins, C.; Craig, W.; Immel, T. J.; Turin, P.; Darling, N.; Loicq, J.; Blain, P.; Syrstad, E.; Thompson, B.; Burt, R.; Champagne, J.; Sevilla, P.; Ellis, S.

2017-10-01

ICON Far UltraViolet (FUV) imager contributes to the ICON science objectives by providing remote sensing measurements of the daytime and nighttime atmosphere/ionosphere. During sunlit atmospheric conditions, ICON FUV images the limb altitude profile in the shortwave (SW) band at 135.6 nm and the longwave (LW) band at 157 nm perpendicular to the satellite motion to retrieve the atmospheric O/N2 ratio. In conditions of atmospheric darkness, ICON FUV measures the 135.6 nm recombination emission of O+ ions used to compute the nighttime ionospheric altitude distribution. ICON Far UltraViolet (FUV) imager is a Czerny-Turner design Spectrographic Imager with two exit slits and corresponding back imager cameras that produce two independent images in separate wavelength bands on two detectors. All observations will be processed as limb altitude profiles. In addition, the ionospheric 135.6 nm data will be processed as longitude and latitude spatial maps to obtain images of ion distributions around regions of equatorial spread F. The ICON FUV optic axis is pointed 20 degrees below local horizontal and has a steering mirror that allows the field of view to be steered up to 30 degrees forward and aft, to keep the local magnetic meridian in the field of view. The detectors are micro channel plate (MCP) intensified FUV tubes with the phosphor fiber-optically coupled to Charge Coupled Devices (CCDs). The dual stack MCP-s amplify the photoelectron signals to overcome the CCD noise and the rapidly scanned frames are co-added to digitally create 12-second integrated images. Digital on-board signal processing is used to compensate for geometric distortion and satellite motion and to achieve data compression. The instrument was originally aligned in visible light by using a special grating and visible cameras. Final alignment, functional and environmental testing and calibration were performed in a large vacuum chamber with a UV source. The test and calibration program showed that ICON FUV meets its design requirements and is ready to be launched on the ICON spacecraft.

UV Coatings, Polarization, and Coronagraphy

NASA Technical Reports Server (NTRS)

Bolcar, Matthew R.; Quijada, Manuel; West, Garrett; Balasubramanian, Bala; Krist, John; Martin, Stefan; Sabatke, Derek

2016-01-01

Presenation for the Large UltraViolet Optical Infrared (LUVOIR) and Habitable Exoplanet Imager (HabEx) Science and Technology Definition Teams (STDT) on technical considerations regarding ultraviolet coatings, polarization, and coronagraphy. The presentations review the state-of-the-art in ultraviolet coatings, how those coatings generate polarization aberrations, and recent study results from both the LUVOIR and HabEx teams.

A Preliminary Lattice Study of the Glue in the Nucleon

NASA Astrophysics Data System (ADS)

Göckeler, M.; Horsley, R.; Ilgenfritz, E.-M.; Oelrich, H.; Perlt, H.; Rakow, P. E. L.; Schierholz, G.; Schiller, A.; Stephenson, P.

1997-02-01

About half the mass of a hadron is given from gluonic contributions. In this talk we calculate the chromoelectric and chromo-magnetic components of the nucleon mass. These computations are numerically difficult due to gluon field ultra-violet fluctuations. Nevertheless a high statistics feasibility run using quenched Wilson fermions seems to show reasonable signals.

Prevalence of Sun Protection at Outdoor Recreation and Leisure Venues at Resorts in North America

ERIC Educational Resources Information Center

Walkosz, Barbara J.; Scott, Michael D.; Buller, David B.; Andersen, Peter A.; Beck, Larry; Cutter, Gary R.

2017-01-01

Background: Exposure to solar ultra violet radiation (UVR) is a primary risk factor for skin cancer. Vacationers often fail to protect themselves from harmful UVR. Purpose: The study assessed the sun protection practices of resort guests in various outdoor leisure and recreation venues during warm-weather seasons. Method: Forty-one North American…

78 FR 25946 - Hardwood and Decorative Plywood From the People's Republic of China: Antidumping Duty Investigation

Federal Register 2010, 2011, 2012, 2013, 2014

2013-05-03

..., ultra-violet light cured polyurethanes, oil or oil-modified or water based polyurethanes, wax, epoxy... obscure the grain, texture or markings of wood include, but are not limited to, paper, aluminum, high... to the CBP. See Notice of Final Determination of Sales at Less Than Fair Value, and Negative...

A Low-Cost Liquid-Chromatography System Using a Spectronic 20-Based Detector.

ERIC Educational Resources Information Center

Jezorek, John R.; And Others

1986-01-01

Describes the design and evaluation of a Spectronic 20-based detector as well as a simple system for postcolumn derivatization useful for metal-ion chromatographic detection. Both detection and derivatization can be performed in the ultra-violet (UV) mode using a low-cost UV-visible spectrophotometer and UV-region derivatization reagents. (JN)

40 CFR 63.497 - Back-end process provisions-monitoring provisions for control and recovery devices used to comply...

Code of Federal Regulations, 2013 CFR

2013-07-01

... thermocouple, ultra-violet beam sensor, or infrared sensor) capable of continuously detecting the presence of a..., as appropriate. (1) Where an incinerator is used, a temperature monitoring device equipped with a... temperature monitoring device shall be installed in the firebox or in the ductwork immediately downstream of...

40 CFR 63.497 - Back-end process provisions-monitoring provisions for control and recovery devices used to comply...

Code of Federal Regulations, 2014 CFR

2014-07-01

... thermocouple, ultra-violet beam sensor, or infrared sensor) capable of continuously detecting the presence of a..., as appropriate. (1) Where an incinerator is used, a temperature monitoring device equipped with a... temperature monitoring device shall be installed in the firebox or in the ductwork immediately downstream of...

40 CFR 63.497 - Back-end process provisions-monitoring provisions for control and recovery devices used to comply...

Code of Federal Regulations, 2012 CFR

2012-07-01

... thermocouple, ultra-violet beam sensor, or infrared sensor) capable of continuously detecting the presence of a..., as appropriate. (1) Where an incinerator is used, a temperature monitoring device equipped with a... temperature monitoring device shall be installed in the firebox or in the ductwork immediately downstream of...

A flow-injection mass spectrometry fingerprinting method for authentication and quality assessment of Scutellaria lateriflora-based dietary supplements

USDA-ARS?s Scientific Manuscript database

Identification and differentiation of anthocyanins and non-anthocyanin compounds in natural products can be very difficult by mass spectrometry. Using a ultra-violet/visible detector can be helpful, but not fool-proof, and it requires an additional detector. To solve the problem, a fast and reliab...

Latest developments on EUV reticle and pellicle research and technology at TNO

NASA Astrophysics Data System (ADS)

Verberk, Rogier; Koster, Norbert; te Sligte, Edwin; Staring, Wilbert

2017-06-01

At TNO an extensive EUV optics life time program has been running for over 15 years together with our partners ASML and Carl Zeiss. This has contributed to the upcoming introduction of EUV High Volume Manufacturing (HVM). To further help the industry with the introduction of EUV, TNO has worked on extending their facilities with a number of reticle and pellicle research infrastructure facilities. In this paper we will show some of the facilities that are available at TNO and shortly introduce their capabilities. Recently we have opened our EBL2 facility, which is an EUV Beam Line (EBL2) meant for studying the effects of high power EUV illumination on optics, reticles and pellicles up to the power roadmap of 500 W at intermediate Focus (IF). This facility is open to users from all over the world and is beneficial for the industry in helping developing alternative capping layers and contamination control strategies for optics lifetime, new absorber materials, pellicles and resists. The EBL2 system has seen first light in December 2016 and is now in the final stage of acceptance testing and qualification. It is expected that the system will be fully operational in the third quarter of 2017, and available for users. It is possible to transfer reticles to and from the EBL2 by means of the reticle handler using the dual pod interface. This secures backside cleanliness to NXE standards and thus enables wafer printing on a NXE tool in a later stage after the exposures and inspection at EBL2. Besides EBL2, a high performance and ultra-clean reticle handler is available at TNO. This handler incorporates our particle scanner Rapid Nano 4 for front side inspection of reticle blanks with a detection limit down to 20 nm particles. Attached to the handler is also an Optical Coherence Tomography (OCT) inspection tool for back-side reticle or pellicle inspection with a resolution down to 1 micron.

Novel MRF fluid for ultra-low roughness optical surfaces

NASA Astrophysics Data System (ADS)

Dumas, Paul; McFee, Charles

2014-08-01

Over the past few years there have been an increasing number of applications calling for ultra-low roughness (ULR) surfaces. A critical demand has been driven by EUV optics, EUV photomasks, X-Ray, and high energy laser applications. Achieving ULR results on complex shapes like aspheres and X-Ray mirrors is extremely challenging with conventional polishing techniques. To achieve both tight figure and roughness specifications, substrates typically undergo iterative global and local polishing processes. Typically the local polishing process corrects the figure or flatness but cannot achieve the required surface roughness, whereas the global polishing process produces the required roughness but degrades the figure. Magnetorheological Finishing (MRF) is a local polishing technique based on a magnetically-sensitive fluid that removes material through a shearing mechanism with minimal normal load, thus removing sub-surface damage. The lowest surface roughness produced by current MRF is close to 3 Å RMS. A new ULR MR fluid uses a nano-based cerium as the abrasive in a proprietary aqueous solution, the combination of which reliably produces under 1.5Å RMS roughness on Fused Silica as measured by atomic force microscopy. In addition to the highly convergent figure correction achieved with MRF, we show results of our novel MR fluid achieving <1.5Å RMS roughness on fused silica and other materials.

Toward compact and ultra-intense laser-based soft x-ray lasers

NASA Astrophysics Data System (ADS)

Sebban, S.; Depresseux, A.; Oliva, E.; Gautier, J.; Tissandier, F.; Nejdl, J.; Kozlova, M.; Maynard, G.; Goddet, J. P.; Tafzi, A.; Lifschitz, A.; Kim, H. T.; Jacquemot, S.; Rousseau, P.; Zeitoun, P.; Rousse, A.

2018-01-01

We report here recent work on an optical field ionized (OFI), high-order harmonic-seeded EUV laser. The amplifying medium is a plasma of nickel-like krypton obtained by OFI when focusing a 1 J, 30 fs, circularly-polarized, infrared pulse into a krypton-filled gas cell or krypton gas jet. The lasing transition is the 3d94d (J = 0) → 3d94p (J = 1) transition of Ni-like krypton ions at 32.8 nm and is pumped by collisions with hot electrons. The gain dynamics was probed by seeding the amplifier with a high-order harmonic pulse at different delays. The gain duration monotonically decreased from 7 ps to an unprecedented shortness of 450 fs full width at half-maximum as the amplification peak rose from 150 to 1200 with an increase of the plasma density from 3 × 1018 to 1.2 × 1020 cm-3. The integrated energy of the EUV laser pulse was also measured, and found to be around 2 μJ. It is to be noted that in the ASE mode, longer amplifiers were achieved (up to 2 cm), yielding EUV outputs up to 14 μJ.

Diffractive element in extreme-UV lithography condenser

DOEpatents

Sweatt, William C.; Ray-Chaudhuri, Avijit

2001-01-01

Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

Diffractive element in extreme-UV lithography condenser

DOEpatents

Sweatt, William C.; Ray-Chaudhurl, Avijit K.

2000-01-01

Condensers having a mirror with a diffraction grating in projection lithography using extreme ultra-violet significantly enhances critical dimension control. The diffraction grating has the effect of smoothing the illumination at the camera's entrance pupil with minimum light loss. Modeling suggests that critical dimension control for 100 nm features can be improved from 3 nm to less than about 0.5 nm.

PDSS/IMC CIS user's guide

NASA Technical Reports Server (NTRS)

1984-01-01

The Spacelab Payload Development Support System PDSS Image Motion Compensator (IMC) computer interface simulation (CIS) user's manual is given. The software provides a real time interface simulation for the following IMC subsystems: the Dry Rotor Reference Unit, the Advanced Star/Target Reference Optical sensor, the Ultra Violet imaging telescope, the Wisconson Ultraviolet Photopolarimetry Experiment, the Cruciform Power distributor, and the Spacelab Experiment Computer Operating System.

EFFECT OF ULTRA-VIOLET IRRADIATION OF RIBONUCLEIC ACID ON ITS CHROMATOGRAPHIC BEHAVIOUR

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kubinski, H.

1963-11-01

Experiments were made to illustrate the effects of ultraviolet radiation on RNA isolated from uninfected mammalian cells as well as those from those infected with polio virus. The chromatographic recovery of irradiated RNA, as judged by ultraviolet adsorbance and radioactivity (no plaque formers were found after irradiation), was considerably lower than that of unirradiated RNA. (P.C.H.)

A wearable pressure sensor based on ultra-violet/ozone microstructured carbon nanotube/polydimethylsiloxane arrays for electronic skins.

PubMed

Yu, Guohui; Hu, Jingdong; Tan, Jianping; Gao, Yang; Lu, Yongfeng; Xuan, Fuzhen

2018-03-16

Pressure sensors with high performance (e.g., a broad pressure sensing range, high sensitivities, rapid response/relaxation speeds, temperature-stable sensing), as well as a cost-effective and highly efficient fabrication method are highly desired for electronic skins. In this research, a high-performance pressure sensor based on microstructured carbon nanotube/polydimethylsiloxane arrays was fabricated using an ultra-violet/ozone (UV/O 3 ) microengineering technique. The UV/O 3 microengineering technique is controllable, cost-effective, and highly efficient since it is conducted at room temperature in an ambient environment. The pressure sensor offers a broad pressure sensing range (7 Pa-50 kPa), a sensitivity of ∼ -0.101 ± 0.005 kPa -1 (<1 kPa), a fast response/relaxation speed of ∼10 ms, a small dependence on temperature variation, and a good cycling stability (>5000 cycles), which is attributed to the UV/O 3 engineered microstructures that amplify and transfer external applied forces and rapidly store/release the energy during the PDMS deformation. The sensors developed show the capability to detect external forces and monitor human health conditions, promising for the potential applications in electronic skin.

Activation of KGFR-Akt-mTOR-Nrf2 signaling protects human retinal pigment epithelium cells from Ultra-violet.

PubMed

Hu, Haitao; Hao, Lanxiang; Tang, Chunzhou; Zhu, Yunxi; Jiang, Qin; Yao, Jin

2018-01-15

Ultra-violet (UV) radiation causes oxidative injuries to human retinal pigment epithelium (RPE) cells. We tested the potential effect of keratinocyte growth factor (KGF) against the process. KGF receptor (KGFR) is expressed in ARPE-19 cells and primary human RPE cells. Pre-treatment with KGF inhibited UV-induced reactive oxygen species (ROS) production and RPE cell death. KGF activated nuclear-factor-E2-related factor 2 (Nrf2) signaling in RPE cells, causing Nrf2 Ser-40 phosphorylation, stabilization and nuclear translocation as well as expression of Nrf2-dependent genes (HO1, NOQ1 and GCLC). Nrf2 knockdown (by targeted shRNAs) or S40T mutation almost reversed KGF-induced RPE cell protection against UV. Further studies demonstrated that KGF activated KGFR-Akt-mTORC1 signaling to mediate downstream Nrf2 activation. KGFR shRNA or Akt-mTORC1 inhibition not only blocked KGF-induced Nrf2 Ser-40 phosphorylation and activation, but also nullified KGF-mediated RPE cell protection against UV. We conclude that KGF-KGFR activates Akt-mTORC1 downstream Nrf2 signaling to protect RPE cells from UV radiation. Copyright © 2017 Elsevier Inc. All rights reserved.

NASA Ames UV-LED Poster Overview

NASA Technical Reports Server (NTRS)

Jaroux, Belgacem Amar

2015-01-01

UV-LED is a small satellite technology demonstration payload being flown on the Saudisat-4 spacecraft that is demonstrating non-contacting charge control of an isolated or floating mass using new solid-state ultra-violet light emitting diodes (UV-LEDs). Integrated to the rest of the spacecraft and launched on a Dnepr in June 19, 2014, the project is a collaboration between the NASA Ames Research Center (ARC), Stanford University, and King Abdulaziz City for Science and Technology (KACST). Beginning with its commissioning in December, 2015, the data collected by UV-LED have validated a novel method of charge control that will improve the performance of drag-free spacecraft allowing for concurrent science collection during charge management operations as well as reduce the mass, power and volume required while increasing lifetime and reliability of a charge management subsystem. UV-LED continues to operate, exploring new concepts in non-contacting charge control and collecting data crucial to understanding the lifetime of ultra-violet light emitting diodes in space. These improvements are crucial to the success of ground breaking missions such as LISA and BBO, and demonstrates the ability of low cost small satellite missions to provide technological advances that far exceed mission costs.

Reaction of photochemical resists used in screen printing under the influence of digitally modulated ultra violet light

NASA Astrophysics Data System (ADS)

Gmuender, T.

2017-02-01

Different chemical photo-reactive emulsions are used in screen printing for stencil production. Depending on the bandwidth, optical power and depth of field from the optical system, the reaction / exposure speed has a diverse value. In this paper, the emulsions get categorized and validated in a first step. After that a mathematical model gets developed and adapted due to heuristic experience to estimate the exposure speed under the influence of digitally modulated ultra violet (UV) light. The main intention is to use the technical specifications (intended wavelength, exposure time, distance to the stencil, electrical power, stencil configuration) in the emulsion data sheet primary written down with an uncertainty factor for the end user operating with large projector arc lamps and photo films. These five parameters are the inputs for a mathematical formula which gives as an output the exposure speed for the Computer to Screen (CTS) machine calculated for each emulsion / stencil setup. The importance of this work relies in the possibility to rate with just a few boundaries the performance and capacity of an exposure system used in screen printing instead of processing a long test series for each emulsion / stencil configuration.

A wearable pressure sensor based on ultra-violet/ozone microstructured carbon nanotube/polydimethylsiloxane arrays for electronic skins

NASA Astrophysics Data System (ADS)

Yu, Guohui; Hu, Jingdong; Tan, Jianping; Gao, Yang; Lu, Yongfeng; Xuan, Fuzhen

2018-03-01

Pressure sensors with high performance (e.g., a broad pressure sensing range, high sensitivities, rapid response/relaxation speeds, temperature-stable sensing), as well as a cost-effective and highly efficient fabrication method are highly desired for electronic skins. In this research, a high-performance pressure sensor based on microstructured carbon nanotube/polydimethylsiloxane arrays was fabricated using an ultra-violet/ozone (UV/O3) microengineering technique. The UV/O3 microengineering technique is controllable, cost-effective, and highly efficient since it is conducted at room temperature in an ambient environment. The pressure sensor offers a broad pressure sensing range (7 Pa-50 kPa), a sensitivity of ˜ -0.101 ± 0.005 kPa-1 (<1 kPa), a fast response/relaxation speed of ˜10 ms, a small dependence on temperature variation, and a good cycling stability (>5000 cycles), which is attributed to the UV/O3 engineered microstructures that amplify and transfer external applied forces and rapidly store/release the energy during the PDMS deformation. The sensors developed show the capability to detect external forces and monitor human health conditions, promising for the potential applications in electronic skin.

Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics

DOE Office of Scientific and Technical Information (OSTI.GOV)

Marneffe, J.-F. de, E-mail: marneffe@imec.be; Lukaszewicz, M.; Porter, S. B.

2015-10-07

Porous organosilicate glass thin films, with k-value 2.0, were exposed to 147 nm vacuum ultra-violet (VUV) photons emitted in a Xenon capacitive coupled plasma discharge. Strong methyl bond depletion was observed, concomitant with a significant increase of the bulk dielectric constant. This indicates that, besides reactive radical diffusion, photons emitted during plasma processing do impede dielectric properties and therefore need to be tackled appropriately during patterning and integration. The detrimental effect of VUV irradiation can be partly suppressed by stuffing the low-k porous matrix with proper sacrificial polymers showing high VUV absorption together with good thermal and VUV stability. In addition,more » the choice of an appropriate hard-mask, showing high VUV absorption, can minimize VUV damage. Particular processing conditions allow to minimize the fluence of photons to the substrate and lead to negligible VUV damage. For patterned structures, in order to reduce VUV damage in the bulk and on feature sidewalls, the combination of both pore stuffing/material densification and absorbing hard-mask is recommended, and/or the use of low VUV-emitting plasma discharge.« less

Influence of environmental factors on removal of oxides of nitrogen by a photocatalytic coating.

PubMed

Cros, Clement J; Terpeluk, Alexandra L; Crain, Neil E; Juenger, Maria C G; Corsi, Richard L

2015-08-01

Nitrogen oxides (NOx) emitted from combustion processes have elevated concentrations in large urban areas. They cause a range of adverse health effects, acid rain, and are precursors to formation of other atmospheric pollutants, such as ozone, peroxyacetyl nitrate, and inorganic aerosols. Photocatalytic materials containing a semi-conductor that can be activated by sunlight, such as titanium dioxide, have been studied for their ability to remove NOx. The study presented herein aims to elucidate the environmental parameters that most influence the NOx removal efficiency of photocatalytic coatings in hot and humid climate conditions. Concrete samples coated with a commercially available photocatalytic coating (a stucco) and an uncoated sample have been tested in a reactor simulating reasonable summertime outdoor sunlight, relative humidity and temperature conditions in southeast Texas. Two-level full factorial experiments were completed on each sample for five parameters. It was found that contact time, relative humidity and temperature significantly influenced both NO and NO₂removal. Elevated concentrations of organic pollutants reduced NO removal by the coating. Ultra-violet light intensity did not significantly influence removal of NO or NO₂, however, ultra-violet light intensity was involved in a two-factor interaction that significantly influenced removal of both NO and NO₂.

An agent-oriented approach to automated mission operations

NASA Technical Reports Server (NTRS)

Truszkowski, Walt; Odubiyi, Jide

1994-01-01

As we plan for the next generation of Mission Operations Control Center (MOCC) systems, there are many opportunities for the increased utilization of innovative knowledge-based technologies. The innovative technology discussed is an advanced use of agent-oriented approaches to the automation of mission operations. The paper presents an overview of this technology and discusses applied operational scenarios currently being investigated and prototyped. A major focus of the current work is the development of a simple user mechanism that would empower operations staff members to create, in real time, software agents to assist them in common, labor intensive operations tasks. These operational tasks would include: handling routine data and information management functions; amplifying the capabilities of a spacecraft analyst/operator to rapidly identify, analyze, and correct spacecraft anomalies by correlating complex data/information sets and filtering error messages; improving routine monitoring and trend analysis by detecting common failure signatures; and serving as a sentinel for spacecraft changes during critical maneuvers enhancing the system's capabilities to support nonroutine operational conditions with minimum additional staff. An agent-based testbed is under development. This testbed will allow us to: (1) more clearly understand the intricacies of applying agent-based technology in support of the advanced automation of mission operations and (2) access the full set of benefits that can be realized by the proper application of agent-oriented technology in a mission operations environment. The testbed under development addresses some of the data management and report generation functions for the Explorer Platform (EP)/Extreme UltraViolet Explorer (EUVE) Flight Operations Team (FOT). We present an overview of agent-oriented technology and a detailed report on the operation's concept for the testbed.

Above the Noise: The Search for Periodicities in the Inner Heliosphere

NASA Astrophysics Data System (ADS)

Threlfall, James; De Moortel, Ineke; Conlon, Thomas

2017-11-01

Remote sensing of coronal and heliospheric periodicities can provide vital insight into the local conditions and dynamics of the solar atmosphere. We seek to trace long (one hour or longer) periodic oscillatory signatures (previously identified above the limb in the corona by, e.g., Telloni et al. in Astrophys. J. 767, 138, 2013) from their origin at the solar surface out into the heliosphere. To do this, we combined on-disk measurements taken by the Atmospheric Imaging Assembly (AIA) onboard the Solar Dynamics Observatory (SDO) and concurrent extreme ultra-violet (EUV) and coronagraph data from one of the Solar Terrestrial Relations Observatory (STEREO) spacecraft to study the evolution of two active regions in the vicinity of an equatorial coronal hole over several days in early 2011. Fourier and wavelet analysis of signals were performed. Applying white-noise-based confidence levels to the power spectra associated with detrended intensity time series yields detections of oscillatory signatures with periods from 6 - 13 hours in both AIA and STEREO data. As was found by Telloni et al. (2013), these signatures are aligned with local magnetic structures. However, typical spectral power densities all vary substantially as a function of period, indicating spectra dominated by red (rather than white) noise. Contrary to the white-noise-based results, applying global confidence levels based on a generic background-noise model (allowing a combination of white noise, red noise, and transients following Auchère et al. in Astrophys. J. 825, 110, 2016) without detrending the time series uncovers only sporadic, spatially uncorrelated evidence of periodic signatures in either instrument. Automating this method to individual pixels in the STEREO/COR coronagraph field of view is non-trivial. Efforts to identify and implement a more robust automatic background noise model fitting procedure are needed.

An Overview of the Solar-C Mission

NASA Astrophysics Data System (ADS)

Lemen, J. R.; Tarbell, T. D.; Cirtain, J. W.; DeLuca, E. E.; Doschek, G. A.

2013-12-01

Solar-C is a new mission in solar and heliospheric physics that is being proposed to JAXA for launch in 2020. It will be led by Japan with major contributions from the US and Europe. The main scientific objectives of the mission are to: * Determine the properties and evolution of the three dimensional magnetic field, especially on small spatial scales, using direct spectro-polarimetric measurements in the photosphere and chromosphere, and accurate model extrapolations and dynamic simulations into the corona that are based, for the first time, on boundary fields observed in a low plasma beta region; * Observe and understand fundamental physical processes such as magnetic reconnection, magneto-hydrodynamic waves, shocks, turbulence, and plasma instabilities * Reveal the mechanisms responsible for the heating and dynamics of the chromosphere and corona and the acceleration of the solar wind, and understand how plasma and energy are transferred between different parts of the solar atmosphere; * Determine the physical origin of the large-scale explosions and eruptions (flares, jets, and CMEs) that drive short-term solar, heliospheric, and geospace variability. To achieve the science objectives, Solar-C will deploy a carefully coordinated suite of three complementary instruments: the Solar Ultra-violet Visible and IR Telescope (SUVIT), the high-throughput EUV Spectroscopic Telescope (EUVST), and an X-ray Imaging Telescope/Extreme Ultraviolet Telescope (XIT). For the first time, it will simultaneously observe the entire atmosphere---photosphere, chromosphere, transition region, and corona---and do so with essentially the same spatial and temporal resolution at all locations. As is the case for other solar observatories, the Solar-C mission will have an open data policy. We provide an overview of the mission and its contributions to the future of solar physics and space weather research.

Ultra-Violet/Electron Beam Detoxification of Nitroglycerin/Propylene Glycol Dinrate Waste Water, Phase 1

DTIC Science & Technology

1994-03-16

University of Vienna’s Institute for Theoretical and Radiation Chemistry provided assistance in the development of chemical theory. Z. Liu, Associate...Professor of Applied Chemistry at the University of Science and Technology, Hefei, Peoples Republic of China provided support with physical measurements. The...include Glyocollic acid " Inogani Nitates> 90 nitroglycerine, propylene glycol dinitrate Inorganic Nitrates (PGDN), trimethylolethane trinitrate MDL

Durable Corrosion and Ultraviolet-Resistant Silver Mirror

DOEpatents

Jorgensen, G. J.; Gee, R.

2006-01-24

A corrosion and ultra violet-resistant silver mirror for use in solar reflectors; the silver layer having a film-forming protective polymer bonded thereto, and a protective shield overlay comprising a transparent multipolymer film that incorporates a UV absorber. The corrosion and ultraviolet resistant silver mirror retains spectral hemispherical reflectance and high optical clarity throughout the UV and visible spectrum when used in solar reflectors.

The Use of Ultra-Violet (UV) Light Emitting Diodes (LEDS) in an Advanced Oxidation Process (AOP) with Brilliant Blue FCF as an Indicator

DTIC Science & Technology

2015-03-26

by low, direct current voltage, which are consistent with portable power sources such as batteries or photovoltaic cells (Crystal IS 2013...of Methylene Blue Adsorption on Power Output .................23 vii UV LED Quartz Lens Adsorption Experiment...29 Effect of Methylene Blue Adsorption on Power Output ............................................29 Figure 5 - Percent reduction of

Enhanced hole boring with two-color relativistic laser pulses in the fast ignition scheme

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yu, Changhai; Tian, Ye; Li, Wentao

A scheme of using two-color laser pulses for hole boring into overdense plasma as well as energy transfer into electron and ion beams has been studied using particle-in-cell simulations. Following an ultra-short ultra-intense hole-boring laser pulse with a short central wavelength in extreme ultra-violet range, the main infrared driving laser pulse can be guided in the hollow channel preformed by the former laser and propagate much deeper into an overdense plasma, as compared to the case using the infrared laser only. In addition to efficiently transferring the main driving laser energy into energetic electrons and ions generation deep inside themore » overdense plasma, the ion beam divergence can be greatly reduced. The results might be beneficial for the fast ignition concept of inertial confinement fusion.« less

Development of extreme ultraviolet and soft x-ray multilayer optics for scientific studies with femtosecond/attosecond sources

DOE Office of Scientific and Technical Information (OSTI.GOV)

Aquila, Andrew Lee

The development of multilayer optics for extreme ultraviolet (EUV) radiation has led to advancements in many areas of science and technology, including materials studies, EUV lithography, water window microscopy, plasma imaging, and orbiting solar physics imaging. Recent developments in femtosecond and attosecond EUV pulse generation from sources such as high harmonic generation lasers, combined with the elemental and chemical specificity provided by EUV radiation, are opening new opportunities to study fundamental dynamic processes in materials. Critical to these efforts is the design and fabrication of multilayer optics to transport, focus, shape and image these ultra-fast pulses This thesis describes themore » design, fabrication, characterization, and application of multilayer optics for EUV femtosecond and attosecond scientific studies. Multilayer mirrors for bandwidth control, pulse shaping and compression, tri-material multilayers, and multilayers for polarization control are described. Characterization of multilayer optics, including measurement of material optical constants, reflectivity of multilayer mirrors, and metrology of reflected phases of the multilayer, which is critical to maintaining pulse size and shape, were performed. Two applications of these multilayer mirrors are detailed in the thesis. In the first application, broad bandwidth multilayers were used to characterize and measure sub-100 attosecond pulses from a high harmonic generation source and was performed in collaboration with the Max-Planck institute for Quantum Optics and Ludwig- Maximilians University in Garching, Germany, with Professors Krausz and Kleineberg. In the second application, multilayer mirrors with polarization control are useful to study femtosecond spin dynamics in an ongoing collaboration with the T-REX group of Professor Parmigiani at Elettra in Trieste, Italy. As new ultrafast x-ray sources become available, for example free electron lasers, the multilayer designs described in this thesis can be extended to higher photon energies, and such designs can be used with those sources to enable new scientific studies, such as molecular bonding, phonon, and spin dynamics.« less

High-performance envelopes for wood

Treesearch

Roger M. Rowell

2007-01-01

Wood can be coated with a clear finish, stained or painted to provide protection from water and ultra violet energy. In this case the coating and wood are two different phases that coexist. Another approach is to provide protection by “coating” in the surface not on the surface. Such an approach is referred to as an envelop rather than a coating. This can be done in...

Advanced Ultra-Violet (UV) Aircraft Fire Detection System. Volume 3. Ground Support Equipment (GSE) for System Check-Out

DTIC Science & Technology

1982-08-01

linsutaled * ifr rnif OC used nstead of ins resistors). 76 _ - Thil positions are as follows. 76 .APPENDIX A-2 3.2 PAper Loading TI’a6414ý-;jies lphnumeic ji...34i I I S.... . . I. ..... . .... •..................... ..- 4 . . o .. o . . .... . 149 :. ; , e~Vh -rom PPE ~t~ilk A-9 e" OSE S ~1: el/THIGH Is

Uranium plasma emission coefficient in the visible and near UV.

NASA Technical Reports Server (NTRS)

Mack, J. M., Jr.; Usher, J. L.; Schneider, R. T.; Campbell, H. D.

1971-01-01

Measurements of the specific emission coefficient in the near ultra-violet and visible region of a uranium arc plasma are reported. Spatial unfolding of the intensity profile is used to determine the emission coefficient in the spectral range of 2000 A to 6000 A. The uranium partial pressure is estimated to range between .001 and .01 atmosphere, and the corresponding temperature range is 5000 - 10,000 K.

Phase recording for formation of holographic optical elements on silver-halide photographic emulsions

NASA Astrophysics Data System (ADS)

Ganzherli, Nina M.; Gulyaev, Sergey N.; Maurer, Irina A.; Chernykh, Dmitrii F.

2009-05-01

Holographic fabrication methods of regular and nonregular relief-phase structures on silver-halide photographic emulsions are considered. Methods of gelatin photodestruction under short-wave ultra-violet radiation and chemical hardening with the help of dichromated solutions were used as a technique for surface relief formation. The developed techniques permitted us to study specimens of holographic diffusers and microlens rasters with small absorption and high light efficiency.

Spectroscopic study of food and food toxins

NASA Astrophysics Data System (ADS)

King, Gavin; Walsh, James E.; Martin, Suzanne

2003-03-01

Fungal infection of food causes billions of dollars of lost revenue per annum as well as health problems, to animals and humans, if consumed in sufficient quantities. Modern food sorting techniques rely on colour or other physical characteristics to filter diseased or otherwise unsuitable foodstuffs from healthy foodstuffs. Their speeds are such that up to 40,000 objects per second can be moved at 4 metres per second, through 1 m wide chutes that offer a wide view for colour and shape sorting. Grain type foods such as coffee or peanuts are often vulnerable to toxic infection from invading fungi. If this happens, then their texture, taste and colour can change. Up to now, only visible wavelengths and colour identification have been used to bulk-sort food, but there has been little research in the ultra violet regions of the spectrum to help identify fungus or toxin infection. This research specifically concentrated on the ultra violet (UV) spectral characteristics of food in an attempt to identify possible spectral changes that occur when healthy food items like peanuts become infected with toxin-producing fungi. Ultimately, the goal is to design, build and construct an optical detection system that can use these 'spectral fingerprints' to more quickly and efficiently detect toxically infected food items.

Simultaneous quantification of voriconazole and posaconazole in human plasma by high-performance liquid chromatography with ultra-violet detection.

PubMed

Chhun, Stéphanie; Rey, Elisabeth; Tran, Agnes; Lortholary, Olivier; Pons, Gérard; Jullien, Vincent

2007-06-01

A sensitive and selective high-performance liquid chromatographic (HPLC) method with ultra-violet detection has been developed and validated for the simultaneous determination of posaconazole and voriconazole, two systemic anti-fungal agents. An internal standard diazepam was added to 100 microL of human plasma followed by 3 mL of hexane-methylene chloride (70:30, v/v). The organic layer was evaporated to dryness and the residue was reconstituted with 100 microL of mobile phase before being injected in the chromatographic system. The compounds were separated on a C8 column using sodium potassium phosphate buffer (0.04 M, pH 6.0): acetonitrile:ultrapure water (45:52.5:2.5, v/v/v) as mobile phase. All compounds were detected at a wavelength of 255 nm. The assay was linear and validated over the range 0.2-10.0 mg/L for voriconazole and 0.05-10.0 mg/L for posaconazole. The biases were comprised between -3 and 5% for voriconazole and -2 and 8% for posaconazole. The intra- and inter-day precisions of the method were lower than 8% for the routine quality control (QC). The mean recovery was 98% for voriconazole and 108% for posaconazole. This method provides a useful tool for therapeutic drug monitoring.

Understanding CMEs using plasma diagnostics of the related dimmings

NASA Astrophysics Data System (ADS)

Vanninathan, Kamalam; Veronig, Astrid; Gomory, Peter; Dissauer, Karin; Temmer, Manuela; Hannah, Iain; Kontar, Eduard

2017-04-01

Coronal Mass Ejections (CMEs) are often associated with dimmings that are well observed in Extreme Ultra-violet (EUV) wavelengths. Such dimmings are suggested to represent the evacuation of mass that is carried out by CMEs and are a unique and indirect means to study CME properties. While Earth-directed CMEs (on-disk CMEs) are difficult to observe due to the bright background solar disk and projection effects, their corresponding dimmings are clearly discernible and ideally suited for analysis. Using data from the 6 EUV channels of Solar Dynamics Observatory/Atmospheric Imaging Assembly for Differential Emission Measure (DEM) diagnostics, we determine the plasma characteristics of the dimming region. These data are well suited for this kind of study due to the good temperature ranges covered by the multiple passbands of the instrument. We analyse 7 on-disk and 5 off-limb events and derive the weighted density and temperature as a function of time, from the DEMs. From such an analysis we differentiate 2 types of dimming regions: core and secondary dimmings. Core dimmings often occur in pairs lying on either sides of the active region and in opposite polarity regions while the secondary dimming is more extended. In both the regions the derived plasma parameters reach a minimum within 30-60 min after the flare. For each event the core dimming region shows a higher decrease in density and temperature than the corresponding secondary dimming regions. The values of these parameters remains low within the core dimming region for the entire duration of this study ( 10 hrs after the flare) while the secondary dimming region starts to show a gradual increase after 1-2 hrs. We also use spectroscopic data from Hinode/Extreme-Ultraviolet Imaging Spectrometer to differentiate core and secondary dimming regions. We find that the Fe XIII 202 Å line shows double component profiles within the core dimming region with strong blueshifts of 100 km/s while the secondary dimming region has weak upflows of 10 km/s. We conclude that the core dimming region corresponds to footpoints of the erupting flux rope from where there is continuous strong upflowing plasma for at least 10 hrs after the flare, while the secondary dimming region begins to refill within 1-2 hrs. These measurements can be used to deduce information about the mass of on-disk CMEs where white light measurements can fail. We also confirm that the dimmings are mainly caused by density decrease and not temperature changes. DEM analysis is a strong tool to decipher CME properties from dimming regions.

Ultra-high density diffraction grating

DOEpatents

Padmore, Howard A.; Voronov, Dmytro L.; Cambie, Rossana; Yashchuk, Valeriy V.; Gullikson, Eric M.

2012-12-11

A diffraction grating structure having ultra-high density of grooves comprises an echellette substrate having periodically repeating recessed features, and a multi-layer stack of materials disposed on the echellette substrate. The surface of the diffraction grating is planarized, such that layers of the multi-layer stack form a plurality of lines disposed on the planarized surface of the structure in a periodical fashion, wherein lines having a first property alternate with lines having a dissimilar property on the surface of the substrate. For example, in one embodiment, lines comprising high-Z and low-Z materials alternate on the planarized surface providing a structure that is suitable as a diffraction grating for EUV and soft X-rays. In some embodiments, line density of between about 10,000 lines/mm to about 100,000 lines/mm is provided.

Selective Dry Etch for Defining Ohmic Contacts for High Performance ZnO TFTs

DTIC Science & Technology

2014-03-27

scale, high-frequency ZnO thin - film transistors (TFTs) could be fabricated. Molybdenum, tantalum, titanium tungsten 10-90, and tungsten metallic contact... thin - film transistor layout utilized in the thesis research . . . . . 42 3.4 Process Flow Diagram for Optical and e-Beam Devices...TFT thin - film transistor TLM transmission line model UV ultra-violet xvii SELECTIVE DRY ETCH FOR DEFINING OHMIC CONTACTS FOR HIGH PERFORMANCE ZnO TFTs

Absolute Two-Photon Absorption Coefficients in UltraViolet Window Materials

DTIC Science & Technology

1977-12-01

fvtt* tld » II ntctHB,-y md Idtnlll’ by block number; The absolute two-photon absorption coefficiehts of u. v. transmitting materials have been...measured using well-calibrated single picosecond pulses, at the third and fourth harmonic of a mode locked Nd:YAG laser systems. Twc photon...30, 1977. Work in the area of laser induced breakdown and multiphoton absorption in ultraviolet and infrared laser window materials was carried

Small-signal modulation characteristics of a polariton laser

PubMed Central

Zunaid Baten, Md; Frost, Thomas; Iorsh, Ivan; Deshpande, Saniya; Kavokin, Alexey; Bhattacharya, Pallab

2015-01-01

Use of large bandgap materials together with electrical injection makes the polariton laser an attractive low-power coherent light source for medical and biomedical applications or short distance plastic fiber communication at short wavelengths (violet and ultra-violet), where a conventional laser is difficult to realize. The dynamic properties of a polariton laser have not been investigated experimentally. We have measured, for the first time, the small signal modulation characteristics of a GaN-based electrically pumped polariton laser operating at room temperature. A maximum −3 dB modulation bandwidth of 1.18 GHz is measured. The experimental results have been analyzed with a theoretical model based on the Boltzmann kinetic equations and the agreement is very good. We have also investigated frequency chirping during such modulation. Gain compression phenomenon in a polariton laser is interpreted and a value is obtained for the gain compression factor. PMID:26154681

Synthesis of Zn1-xCdxO Nanoparticles by Co-Precipitation: Structural, Optical and Photodetection Analysis

NASA Astrophysics Data System (ADS)

Jacob, Anju Anna; Balakrishnan, L.; Meher, S. R.; Shambavi, K.; Alex, Z. C.

Zinc oxide (ZnO) is a wide bandgap semiconductor with excellent photoresponse in ultra-violet (UV) regime. Tuning the bandgap of ZnO by alloying with cadmium can shift its absorption cutoff wavelength from UV to visible (Vis) region. Our work aims at synthesis of Zn1-xCdxO nanoparticles by co-precipitation method for the fabrication of photodetector. The properties of nanoparticles were analyzed using X-ray diffractometer, UV-Vis spectrometer, scanning electron microscope and energy dispersive spectrometer. The incorporation of cadmium without altering the wurtzite structure resulted in the red shift in the absorption edge of ZnO. Further, the photoresponse characteristics of Zn1-xCdxO nanopowders were investigated by fabricating photodetectors. It has been found that with Cd alloying the photosensitivity was increased in the UVA-violet as well in the blue region.

In vitro TAXOL production, by Pestalotiopsis breviseta--a first report.

PubMed

Kathiravan, Govindarajan; Sri Raman, Vithiyanathan

2010-09-01

Coelomycetous fungi were screened for the production of TAXOL. TAXOL production of Pestalotiopsis breviseta fungi is confirmed by Ultra Violet (UV) spectroscopic analysis, Infra Red (IR) analysis, high performance liquid chromatography (HPLC), nuclear magnetic resonance (NMR) and LC-MASS spectroscopy. TAXOL isolated from the P. breviseta fungus was identical with authentic TAXOL and produces 0.064 mg/L (0.128% dry weight of fungal mat). Copyright (c) 2010 Elsevier B.V. All rights reserved.

Application of Atomic Fluorescence to Measurement of Combustion Temperature in Solid Propellants.

DTIC Science & Technology

1986-12-04

into a cytal (yttrium- aluminum -garnet) is shown to be an ideal seed, the fluoresce. f which is stimulated by the ultra-violet output of a Nd:YAG...been successfully employed in atmospheric flames for making thermometric measurements. However, because of the amorphous nature of energetic materials...be determined. R. 6 A .6 An example of this type of behavior is found in trivalent dysprosium, doped at 3% in yttrium- aluminum -garnet (Dy+3 :YAG

Guide to Camouflage for DARCOM Equipment Developers

DTIC Science & Technology

1978-04-29

the trails by dragging devices, etc., can delay recognition of a tracked- veicle trail. A missile system, having fixed physical characteristics which...systems applicable to surface-to-air, air-to-air, and air-to-surface missiles. Sensors in the 0.2 to 0.4 and 1.0 to 5.0 micron bands are hybrid ...a wide variety of ultra- violet, visible and near infrared sensor systems. Actual sensors are hybrid computer controlled in six degrees-of-freedom

Novel Test Fixture for Characterizing Microcontacts: Performance and Reliability

DTIC Science & Technology

2013-03-01

limited to the resolution of the measuring instrument [30]. A fractal method, on the other hand, random surface texture is characterized by scale...areas and allows the exposed 1805 to be developed away (f). After the 1805 is developed, the exposed SF-11 is subjected to deep ultra violet light (DUV...separated by a combination of fracture and plasticity [78]. Gold exhibited ductile behavior at both T=150K and T=300K [78, 80]. The difference in

Innovative Growth and Defect Analysis of Group III - Nitrides for High Speed Electronics

DTIC Science & Technology

2008-02-29

nitrides have optical transitions from the infrared into the ultra violet and are used for light generation with a luminous flux of approximately 100...exist below the detection limit of X- Ray Diffraction (XRD). It has been shown, that metal clusters could cause resonance in the infrared and effect the...plasmonic (Mie) resonances and the specific interband absorption between the parallel bands in metallic indium [Har66]; the latter starts from 0.6

Solar cell module lamination process

DOEpatents

Carey, Paul G.; Thompson, Jesse B.; Aceves, Randy C.

2002-01-01

A solar cell module lamination process using fluoropolymers to provide protection from adverse environmental conditions and thus enable more extended use of solar cells, particularly in space applications. A laminate of fluoropolymer material provides a hermetically sealed solar cell module structure that is flexible and very durable. The laminate is virtually chemically inert, highly transmissive in the visible spectrum, dimensionally stable at temperatures up to about 200.degree. C. highly abrasion resistant, and exhibits very little ultra-violet degradation.

Immobilized WO3 nanoparticles on graphene oxide as a photo-induced antibacterial agent against UV-resistant Bacillus pumilus

NASA Astrophysics Data System (ADS)

Hosseini, Farshad; Rasuli, Reza; Jafarian, Vahab

2018-04-01

We present the antibacterial and photo-catalytic activity of immobilized WO3 nanoparticles on graphene oxide sheets. WO3 nanoparticles were immobilized on graphene oxide using the arc discharge method in arc currents of 5, 20, 40 and 60 A. Tauc plots of the UV-visible spectra show that the band gap of the prepared samples decreases (to ~2.7 eV) with respect to the WO3 nanoparticles. Photo-catalytic activity was examined by the degradation of rhodamine B under ultra-violet irradiation and the results show that the photo-catalytic activity of WO3 nanoparticles is increased by immobilizing them on graphene oxide sheets. In addition, the photo-degradation yield of the samples prepared by the 5 A arc current is 84% in 120 min, which is more than that of the other samples. The antibacterial activity of the prepared samples was studied against Bacillus pumilus (B. pumilus) bacteria, showing high resistance to ultra-violet exposure. Our results show that the bare and immobilized WO3 nanoparticles become more active under UV irradiation and their antibacterial properties are comparable with Ag nanoparticles. Besides this, the results show that although the photo-catalytic activity of the post-annealed samples at 500 °C is less than the as-prepared samples, it is, however, more active against B. pumilus bacteria under UV irradiation.

Ultra-violet avalanche photodiode based on AlN/GaN periodically-stacked-structure

NASA Astrophysics Data System (ADS)

Wu, Xingzhao; Zheng, Jiyuan; Wang, Lai; Brault, Julien; Matta, Samuel; Hao, Zhibiao; Sun, Changzheng; Xiong, Bing; Luo, Yi; Han, Yianjun; Wang, Jian; Li, Hongtao; Khalfioui, Mohamed A.; Li, Mo; Kang, Jianbin; Li, Qian

2018-02-01

The high-gain photomultiplier tube (PMT) is the most popular method to detect weak ultra-violet signals which attenuate quickly in atmosphere, although the vacuum tube makes it fragile and difficult to integrate. To overcome the disadvantage of PMT, an AlN/GaN periodically-stacked-structure (PSS) avalanche photodiode (APD) has been proposed, finally achieving good quality of high gain and low excessive noise. As there is a deep g valley only in the conduction band of both GaN and AlN, the electron transfers suffering less scattering and thus becomes easier to obtain the threshold of ionization impact. Because of unipolar ionization in the PSS APD, it works in linear mode. Four prototype devices of 5-period, 10-period, 15-period, and 20-period were fabricated to verify that the gain of APD increases exponentially with period number. And in 20-period device, a recorded high and stable gain of 104 was achieved under constant bias. In addition, it is proved both experimentally and theoretically, that temperature stability on gain is significantly improved in PSS APD. And it is found that the resonant enhancement in interfacial ionization may bring significant enhancement of electron ionization performance. To make further progress in PSS APD, the device structure is investigated by simulation. Both the gain and temperature stability are optimized alternatively by a proper design of periodical thickness and AlN layer occupancy.

Decontamination of poultry feed from ochratoxin A by UV and sunlight radiations.

PubMed

Ameer Sumbal, Gul; Hussain Shar, Zahid; Hussain Sherazi, Syed Tufail; Sirajuddin; Nizamani, Shafi Muhammad; Mahesar, Safaraz Ahmed

2016-06-01

Mycotoxin-contaminated feed is very dangerous for the growth and even life of poultry. The objective of the current study was to investigate the efficacy of ultra-violet irradiation for decontamination of ochratoxin A (OTA) in spiked and naturally contaminated poultry feed samples. Spiked and naturally contaminated feed samples were irradiated with ultra-violet light (UV) at distance of 25 cm over the feed samples. In vitro, the effect of UV intensity (0.1 mW cm(-2) at 254 nm UV-C) on different types of poultry feeds contaminated with OTA was evaluated. The same samples were also irradiated with sunlight and analysed for OTA by an indirect enzyme linked immunosorbent assay method. Poultry feed samples containing 500 µg kg(-1) were 100% decontaminated in 180 min with UV radiation while OTA was decreased to 70-95 µg kg(-1) using the same poultry feed samples after 8 h sunlight irradiation. Therefore, UV light was found to be more effective. Only 1 h of UV irradiation was found to be sufficient to bring the OTA level to the maximum regulatory limit suggested for poultry feeds (100 µg kg(-1) ), while 8 h were needed to obtain this level using sunlight radiations. The proposed approach is a viable option to reduce the level of OTA in contaminated poultry feeds. © 2015 Society of Chemical Industry. © 2015 Society of Chemical Industry.

The Genesis of an Impulsive Coronal Mass Ejection Observed at Ultra-High Cadence by AIA on SDO

DTIC Science & Technology

2010-04-01

Most CMEmodels agree that the final ejected structure is a magnetic fluxrope which may correspond to the cavity observed in 3-part CMEs in the outer ...signals the launch of an EUV wave around the bubble (movie1.mpg) but the wave analysis will be reported elsewhere. The outer rim of the bubble becomes...the upper section of the flux-rope and not to its legs. 2RHESSI was observing the Crab Nebula during our event. – 6 – SXR rise profile arises from the

Comparison of tool feed influence in CNC polishing between a novel circular-random path and other pseudo-random paths.

PubMed

Takizawa, Ken; Beaucamp, Anthony

2017-09-18

A new category of circular pseudo-random paths is proposed in order to suppress repetitive patterns and improve surface waviness on ultra-precision polished surfaces. Random paths in prior research had many corners, therefore deceleration of the polishing tool affected the surface waviness. The new random path can suppress velocity changes of the polishing tool and thus restrict degradation of the surface waviness, making it suitable for applications with stringent mid-spatial-frequency requirements such as photomask blanks for EUV lithography.

New generation of airborne lidar for forest canopy sampling

NASA Astrophysics Data System (ADS)

Cuesta, J.; Chazette, P.; Allouis, T.; Sanak, J.; Genou, P.; Flamant, P. H.; Durrieu, S.; Toussaint, F.

2009-04-01

Cuesta J. (1,2), Chazette P. (1,3), Allouis T. (4), Sanak J. (1,3), Genau P. (2), Flamant P.H. (1), Durrieu S. (4) and Toussaint F. Biomass in forest cover is an essential actor in climate regulation. It is one of the principal sinks of atmospheric CO2 and a major water cycle regulator. In the coming years, climate change may generate an increase in the frequency of fires in the ecosystems, which are already affected in regions as southern Europe, near the Mediterranean basin. For a better understanding and prevention of the risks created by the propagation and intensity of fires, one requires a detailed characterization of the structural parameters of the forest canopy. Such description is as well essential for a proper management and sustainable use of forest resources and the characterization of the evolution of bio-diversity. These environmental and socio-economical issues motivate the development of new remote sensing instruments and methodology, particularly active remote sensing by lidar. These tools should be evaluated in order to achieve a global survey of the forest cover by satellite observation. In this framework, a French effort of the Institut Pierre Simon Laplace (LMD, LSCE and LATMOS) and the CEMAGREF has led to the deployment of a new airborne lidar prototype to study the vertical distribution of the forest canopy in the Landes region in France, around the Arcachon basin and Mimizan. The measuring system is the ultra-violet new generation lidar LAUVA (Lidar Aérosol UtraViolet (Aéroporté), Chazette et al., EST 2007), onboard an Ultra-Light Airplane (ULA). This system was developed by the Comissarait pour l'Energie Atomique and the Centre National de Recherches Scientifiques, originally for atmospheric applications, and it was successfully used in West Africa in the framework of the African Monsoon Multidisciplinary Analyses. After a proper adaptation, this compact and polyvalent lidar onboard an ULA is capable of measuring the forest canopy with an unequal malleability, both in terms of adaptability of instrumental parameters (divergence, field of view, sensitivity, pointing angle) and the flight plan (measuring range and field exploration). The use of a ultra-violet wavelength at 355 nm enables eye-safe emission of energetic laser pulses (16 mJ at 20 Hz). Besides the lidar and geo-referencing instruments, the ULA payload has been completed by two cameras operating at three bands (visible, near infrared and ultra-violet) to retrieve the canopy tri-dimensional structure by stereoscopy. During this experience, the vegetation vertical structure (tree height and crowns, bushes and underbrush) of tree parcels were statistically characterized. A total of three parcels of approximately 500 x 500 m2 composed principally by maritime pines of several ages were sampled following difference experimental configurations. Observations at two flight altitudes at 300 and 500 m were performed, obtaining lidar footprints of 2.4 and 4 m of diameter, respectively. These comparisons will be presented as well as measurements pointing at nadir and 30°. New experiences are planned for 2009 to sample different types of forest cover (leaf and conifers) and optimize the lidar instrument and the associated methodology, in order to achieve a multifunction tool to measure both the forest canopy and the atmospheric components.

60-nm-thick basic photonic components and Bragg gratings on the silicon-on-insulator platform.

PubMed

Zou, Zhi; Zhou, Linjie; Li, Xinwan; Chen, Jianping

2015-08-10

We demonstrate integrated basic photonic components and Bragg gratings using 60-nm-thick silicon-on-insulator strip waveguides. The ultra-thin waveguides exhibit a propagation loss of 0.61 dB/cm and a bending loss of approximately 0.015 dB/180° with a 30 μm bending radius (including two straight-bend waveguide junctions). Basic structures based on the ultra-thin waveguides, including micro-ring resonators, 1 × 2 MMI couplers, and Mach-Zehnder interferometers are realized. Upon thinning-down, the waveguide effective refractive index is reduced, making the fabrication of Bragg gratings possible using the standard 248-nm deep ultra-violet (DUV) photolithography process. The Bragg grating exhibits a stopband width of 1 nm and an extinction ratio of 35 dB, which is practically applicable as an optical filter or a delay line. The transmission spectrum can be thermally tuned via an integrated resistive micro-heater formed by a heavily doped silicon slab beside the waveguide.

Sub-mm Scale Fiber Guided Deep/Vacuum Ultra-Violet Optical Source for Trapped Mercury Ion Clocks

NASA Technical Reports Server (NTRS)

Yi, Lin; Burt, Eric A.; Huang, Shouhua; Tjoelker, Robert L.

2013-01-01

We demonstrate the functionality of a mercury capillary lamp with a diameter in the sub-mm range and deep ultraviolet (DUV)/ vacuum ultraviolet (VUV) radiation delivery via an optical fiber integrated with the capillary. DUV spectrum control is observed by varying the fabrication parameters such as buffer gas type and pressure, capillary diameter, electrical resonator design, and temperature. We also show spectroscopic data of the 199Hg+ hyper-fine transition at 40.5GHz when applying the above fiber optical design. We present efforts toward micro-plasma generation in hollow-core photonic crystal fiber with related optical design and theoretical estimations. This new approach towards a more practical DUV optical interface could benefit trapped ion clock developments for future ultra-stable frequency reference and time-keeping applications.

Study of GaN nanowires converted from β-Ga2O3 and photoconduction in a single nanowire

NASA Astrophysics Data System (ADS)

Kumar, Mukesh; Kumar, Sudheer; Chauhan, Neha; Sakthi Kumar, D.; Kumar, Vikram; Singh, R.

2017-08-01

The formation of GaN nanowires from β-Ga2O3 nanowires and photoconduction in a fabricated single GaN nanowire device has been studied. Wurtzite phase GaN were formed from monoclinic β-Ga2O3 nanowires with or without catalyst particles at their tips. The formation of faceted nanostructures from catalyst droplets presented on a nanowire tip has been discussed. The nucleation of GaN phases in β-Ga2O3 nanowires and their subsequent growth due to interfacial strain energy has been examined using a high resolution transmission electron microscope. The high quality of the converted GaN nanowire is confirmed by fabricating single nanowire photoconducting devices which showed ultra high responsivity under ultra-violet illumination.

3D-printed, sugar cube-size microplasma on a hybrid chip used as a spectral lamp to characterize UV-Vis transmission characteristics of polycarbonate chips for microfluidic applications

NASA Astrophysics Data System (ADS)

Devathasan, D.; Trebych, K.; Karanassios, Vassili

2013-05-01

A 3d-printed, solar-powered, battery-operated, atmospheric-pressure, self-igniting microplasma the size of a sugar-cube has been used as light source to document the Ultra Violet (UV) and visible transmission characteristics of differentthickness polycarbonate chips that are often used for microfluidic applications. The hybrid microplasma chip was fitted with a quartz plate because quartz is transparent to UV.

PARAMETERS OF TEXTURE CHANGE IN PROCESSED FISH: MYOSIN DENATURATION.

PubMed

Chu, George Hao; Sterling, Clarence

1970-03-01

The white muscle of the Sacramento blackfish (Orthodon microlepidotus) was processed by freezing, dehydration, and cooking. Myosin was extracted immediately afterwards or following a period of storage in order to examine evidence for denaturation. The tests used were the solubility of whole muscle protein and the intrinsic viscosity, isoelectric point, ATPase activity, ultra-violet absorption spectrum, and optical rotatory dispersion of purified myosin extract. Almost all measures used showed that denaturation increased in the order: fresh < frozen < frozen-stored < dehydrated < dehydrated-stored < cooked.

Preliminay Investigation of Variation in Some Dark Adaptation Aspects fo Possible Relevance to Military Helicopter Aircrew.

DTIC Science & Technology

1983-06-01

Niven, J.I., McFarland, R.A., and Roughton, F.J. Variations in Visual Thresholds During Carbon Monoxide and Hypoxic Anoxia (abstract). Fed. Proc...and Niven, J.I. Visual Thresholds as an Index of the Modification of the Effects of Anoxia by Glucose. Am. J. Physiol. 144:378-88. 1945. 71... Diphosphoglycerate and Night Vision. Aviat. Space Environ. Med. 52(1):41-44. 1981. 100. Sexton, M., Malone, F. and Farnsworth, D. The Effect of Ultra- violet

Discovery: Near-Earth Asteroid Rendezvous (NEAR)

NASA Technical Reports Server (NTRS)

Veverka, Joseph

1992-01-01

The work carried out under this grant consisted of two parallel studies aimed at defining candidate missions for the initiation of the Discovery Program being considered by NASA's Solar System Exploration Division. The main study considered a Discover-class mission to a Near Earth Asteroid (NEA); the companion study considered a small telescope in Earth-orbit dedicated to ultra violet studies of solar system bodies. The results of these studies are summarized in two reports which are attached (Appendix 1 and Appendix 2).

A baiting system for the oral rabies vaccination of wild foxes and skunks.

PubMed

Johnston, D H; Voigt, D R

1982-01-01

A bait delivery system has been developed for red foxes and skunks in Ontario, Canada. A biomarker (Tetracycline HCl) is incorporated into a meatball in a plastic bag. Deposits of tetracycline in teeth are detected microscopically with ultra-violet illumination of undecalcified sections. Baits were dropped from aircraft at the rate of 35 per km2 and accepted by 70% of foxes and 60% of skunks in the test area. Trials of various strains of inactivated vaccines are in progress.

The investigation of O and N2 densities from the OSO-7 extreme UV data

NASA Technical Reports Server (NTRS)

1975-01-01

The results of solar radiation observations in the extreme ultra-violet spectrum from 200 A to 600 A made by the OSO-7 Satellite were studied. The results of the influence of attenuation by the atmosphere in the 250 to 500 km altitude range are presented. Using published molecular absorption cross-sections at 304 A and 256 A, the Jaccia atmospheric model is validated, and shows that a mean exospheric of 1050 K is appropriate for the sunset data.

Rapid screening for plasmid DNA.

PubMed

Hughes, C; Meynell, G G

1977-03-07

A procedure is described for demonstrating plasmid DNA and its molecular weight, based on rate zonal centrifugation of unlabelled DNA in neutral sucrose gradients containing a low concentration of ethidium bromide. Each DNA species is then visualized as a discrete fluorescent band when the centrifuge tube is illuminated with ultra-violet light. Plasmids exist as closed circular and as relaxed circular molecules, which sediment separately, but during preparation of lysates, closed circular molecules are nicked so that each plasmid forms only a single band of relaxed circles within the gradient.

Mechanisms of Metal Release From Contaminated Coastal Sediments

DTIC Science & Technology

2005-09-01

help while writing my thesis and is a wonderful friend and great handstand coach . Most of all I want to thank my family; my mother, father and sister...as soon as possible. The dried sediment samples were then disaggregated in an agate mortar and pestle and counted with a GeLi detector for 2 1°Pb and...sub-sampled and half the sample was subjected to 5 hours of ultra-violet light (Ace Glass Inc , 1200 W Hg vapor bulb) in the Moffett Laboratory. The UV

Speculations on the consequences to biology of space shuttle-associated increases in global UV-B radiation

NASA Technical Reports Server (NTRS)

Averner, M. M.; Macelroy, R. D.

1977-01-01

Various aspects of the impact of ozone depletion on the biosphere are assessed and discussed. Speculations on the factors which determine the extent and nature of biological damage due to an increased flux of ultra violet light are presented. It is concluded that a complete assessment must consider both direct effects (organisms) as well as indirect effects (ecosystems). The role of computer simulation of ecosystem models as a predictive tool is examined.

USSR Report, Space

DTIC Science & Technology

1984-11-14

objects which have received no particular attention from astro sä»: äI r *r= xs srsr äTS?- Leo." FTD/SNAP CSO: 1866/25 43 YAKUTSK INSTITUTE’S...adapted for extended (up to 5 hours daily) observation of x-ray and ultra- violet sources. The heart of the station is the solar- astro astro ...in space is provided by two sensors: a solar one which "looks at" the sun and an astro one aimed at a bright navigational star. The scan zone of

Ultraviolet out-of-band radiation studies in laser tin plasma sources

NASA Astrophysics Data System (ADS)

Parchamy, Homaira; Szilagyi, John; Masnavi, Majid; Richardson, Martin

2017-11-01

Out-of-band long wavelength emission measurements from high power, high-repetition-rate extreme-ultra-violet lithography (EUVL) laser plasma sources are imperative to estimating heat deposition in EUV mirrors, and the impact of short wavelength light transported through the imaging system to the wafer surface. This paper reports a series of experiments conducted to measure the absolute spectral irradiances of laser-plasmas produced from planar tin targets over the wavelength region of 124 to 164 nm by 1.06 μm wavelength, 10 ns full-width-at-half-maximum Gaussian laser pulses. The use of spherical targets is relevant to the EUVL source scenario. Although plasmas produced from planar surfaces evolve differently, there is a close similarity to the evolution of current from 10.6 μm CO2 laser EUVL sources, which use a pre-pulse from a lower energy solid-state laser to melt and reform an initial spherical droplet into a thin planar disc target. The maximum of radiation conversion efficiency in the 124-164 nm wavelength band (1%/2πsr) occurs at the laser intensity of 1010 W cm-2. A developed collisional-radiative model reveals the strong experimental spectra that originate mainly from the 4d105p2-4d105s5p, 4d105p-4d105s resonance lines, and 4d95p-4d95s unresolved transition arrays from Sn III, Sn IV, and Sn V ions, respectively. The calculated conversion efficiencies using a 2D radiation-hydrodynamics model are in agreement with the measurements. The model predicts the out-of-band (100-400 nm) radiation conversion efficiencies generated by both 1.06 and 10.6 μm pulses. The 10.6 μm laser pulse produces a higher conversion efficiency (12%/2πsr) at the lower laser intensity of 109 W cm-2.

Toward the 5nm technology: layout optimization and performance benchmark for logic/SRAMs using lateral and vertical GAA FETs

NASA Astrophysics Data System (ADS)

Huynh-Bao, Trong; Ryckaert, Julien; Sakhare, Sushil; Mercha, Abdelkarim; Verkest, Diederik; Thean, Aaron; Wambacq, Piet

2016-03-01

In this paper, we present a layout and performance analysis of logic and SRAM circuits for vertical and lateral GAA FETs using 5nm (iN5) design rules. Extreme ultra-violet lithography (EUVL) processes are exploited to print the critical features: 32 nm gate pitch and 24 nm metal pitch. Layout architectures and patterning compromises for enabling the 5nm node will be discussed in details. A distinct standard-cell template for vertical FETs is proposed and elaborated for the first time. To assess electrical performances, a BSIM-CMG model has been developed and calibrated with TCAD simulations, which accounts for the quasi-ballistic transport in the nanowire channel. The results show that the inbound power rail layout construct for vertical devices could achieve the highest density while the interleaving diffusion template can maximize the port accessibility. By using a representative critical path circuit of a generic low power SoCs, it is shown that the VFET-based circuit is 40% more energy efficient than LFET designs at iso-performance. Regarding SRAMs, benefits given by vertical channel orientation in VFETs has reduced the SRAM area by 20%~30% compared to lateral SRAMs. A double exposures with EUV canner is needed to reach a minimum tip-to-tip (T2T) of 16 nm for middle-of-line (MOL) layers. To enable HD SRAMs with two metal layers, a fully self-aligned gate contact for LFETs and 2D routing of the top electrode for VFETs are required. The standby leakage of vertical SRAMs is 4~6X lower than LFET-based SRAMs at iso-performance and iso-area. The minimum operating voltage (Vmin) of vertical SRAMs is 170 mV lower than lateral SRAMs. A high-density SRAM bitcell of 0.014 um2 can be obtained for the iN5 technology node, which fully follows the SRAM scaling trend for the 45nm nodes and beyond.

A new approach in dry technology for non-degrading optical and EUV mask cleaning

NASA Astrophysics Data System (ADS)

Varghese, Ivin; Smith, Ben; Balooch, Mehdi; Bowers, Chuck

2012-11-01

The Eco-Snow Systems group of RAVE N.P., Inc. has developed a new cleaning technique to target several of the advanced and next generation mask clean challenges. This new technique, especially when combined with Eco-Snow Systems cryogenic CO2 cleaning technology, provides several advantages over existing methods because it: 1) is solely based on dry technique without requiring additional complementary aggressive wet chemistries that degrade the mask, 2) operates at atmospheric pressure and therefore avoids expensive and complicated equipment associated with vacuum systems, 3) generates ultra-clean reactants eliminating possible byproduct adders, 4) can be applied locally for site specific cleaning without exposing the rest of the mask or can be used to clean the entire mask, 5) removes organic as well as inorganic particulates and film contaminations, and 6) complements current techniques utilized for cleaning of advanced masks such as reduced chemistry wet cleans. In this paper, we shall present examples demonstrating the capability of this new technique for removal of pellicle glue residues and for critical removal of carbon contamination on EUV masks.

Depth-resolved ultra-violet spectroscopic photo current-voltage measurements for the analysis of AlGaN/GaN high electron mobility transistor epilayer deposited on Si

NASA Astrophysics Data System (ADS)

Ozden, Burcu; Yang, Chungman; Tong, Fei; Khanal, Min P.; Mirkhani, Vahid; Sk, Mobbassar Hassan; Ahyi, Ayayi Claude; Park, Minseo

2014-10-01

We have demonstrated that the depth-dependent defect distribution of the deep level traps in the AlGaN/GaN high electron mobility transistor (HEMT) epi-structures can be analyzed by using the depth-resolved ultra-violet (UV) spectroscopic photo current-voltage (IV) (DR-UV-SPIV). It is of great importance to analyze deep level defects in the AlGaN/GaN HEMT structure, since it is recognized that deep level defects are the main source for causing current collapse phenomena leading to reduced device reliability. The AlGaN/GaN HEMT epi-layers were grown on a 6 in. Si wafer by metal-organic chemical vapor deposition. The DR-UV-SPIV measurement was performed using a monochromatized UV light illumination from a Xe lamp. The key strength of the DR-UV-SPIV is its ability to provide information on the depth-dependent electrically active defect distribution along the epi-layer growth direction. The DR-UV-SPIV data showed variations in the depth-dependent defect distribution across the wafer. As a result, rapid feedback on the depth-dependent electrical homogeneity of the electrically active defect distribution in the AlGaN/GaN HEMT epi-structure grown on a Si wafer with minimal sample preparation can be elucidated from the DR-UV-SPIV in combination with our previously demonstrated spectroscopic photo-IV measurement with the sub-bandgap excitation.

Determination of Organic Impurities in Anthraquinone Color Additives D&C Violet No. 2 and D&C Green No. 6 by Ultra-High Performance Liquid Chromatography.

PubMed

Yang, H H Wendy

2017-01-01

A new practical and time-saving ultra-high performance liquid chromatography (UHPLC) method has been developed for determining the organic impurities in the anthraquinone color additives D&C Violet No. 2 and D&C Green No. 6. The impurities determined are p-toluidine, 1-hydroxyanthraquinone, 1,4-dihydroxyanthraquinone, and two subsidiary colors. The newly developed UHPLC method uses a 1.7-μ particle size C-18 column, 0.1 M ammonium acetate and acetonitrile as eluents, and photodiode array detection. For the quantification of the impurities, six-point calibration curves were used with correlation coefficients that ranged from 0.9974 to 0.9998. Recoveries of impurities ranged from 99 to 104%. Relative standard deviations ranged from 0.81 to 4.29%. The limits of detection for the impurities ranged from 0.0067% to 0.216%. Samples from sixteen batches of each color additive were analyzed, and the results favorably compared with the results obtained by gravity-elution column chromatography, thin-layer chromatography, and isooctane extraction. Unlike with those other methods, use of the UHPLC method permits all of the impurities to be determined in a single analysis, while also reducing the amount of organic waste and saving time and labor. The method is expected to be implemented by the U.S. Food and Drug Administration for analysis of color additive samples submitted for batch certification.

Warm dark matter via ultra-violet freeze-in: reheating temperature and non-thermal distribution for fermionic Higgs portal dark matter

DOE Office of Scientific and Technical Information (OSTI.GOV)

McDonald, John

2016-08-17

Warm dark matter (WDM) of order keV mass may be able to resolve the disagreement between structure formation in cold dark matter simulations and observations. The detailed properties of WDM will depend upon its energy distribution, in particular how it deviates from the thermal distribution usually assumed in WDM simulations. Here we focus on WDM production via the Ultra-Violet (UV) freeze-in mechanism, for the case of fermionic Higgs portal dark matter ψ produced via the portal interaction ψ-barψH{sup †}H/Λ. We introduce a new method to simplify the computation of the non-thermal energy distribution of dark matter from freeze-in. We showmore » that the non-thermal energy distribution from UV freeze-in is hotter than the corresponding thermal distribution and has the form of a Bose-Einstein distribution with a non-thermal normalization. The resulting range of dark matter fermion mass consistent with observations is 5–7 keV. The reheating temperature must satisfy T{sub R}≳120 GeV in order to account for the observed dark matter density when m{sub ψ}≈5 keV, where the lower bound on T{sub R} corresponds to the limit where the fermion mass is entirely due to electroweak symmetry breaking via the portal interaction. The corresponding bound on the interaction scale is Λ≳6.0×10{sup 9} GeV.« less

International Research Project on the Effects of Chemical Ageing of Polymers on Performance Properties: Chemical and Thermal Analysis

NASA Technical Reports Server (NTRS)

Bulluck, J. W.; Rushing, R. A.

1996-01-01

Work during the past six months has included significant research in several areas aimed at further clarification of the aging and chemical failure mechanism of thermoplastics (PVDF or Tefzel) pipes. Among the areas investigated were the crystallinity changes associated with both the Coflon and Tefzel after various simulated environmental exposures using X-ray diffraction analysis. We have found that significant changes in polymer crystallinity levels occur as a function of the exposures. These crystallinity changes may have important consequences on the fracture, fatigue, tensile, and chemical resistance of the materials. We have also noted small changes in the molecular weight distribution. Again these changes may result in variations in the mechanical and chemical properties in the material. We conducted numerous analytical studies with methods including X-ray Diffraction, Gel Permeation Chromatography, Fourier Transform Infrared Spectroscopy, Ultra- Violet Scanning Analysis, GC/Mass Spectrometry, Differential Scanning Calorimetry and Thermomechanical Analysis. In the ultra-violet analysis we noted the presence of an absorption band indicative of triene formation. We investigated a number of aged samples of both Tefzel and Coflon that were forwarded from MERL. We also cast films at SWT and subjected these films to a refluxing methanol 1% ethylene diamine solution. An updated literature search was conducted using Dialog and DROLLS to identify any new papers that may have been published in the open literature since the start of this project. The updated literature search and abstracts are contained in the Appendix section of this report.

Ultra-violet and visible absorption characterization of explosives by differential reflectometry.

PubMed

Dubroca, Thierry; Moyant, Kyle; Hummel, Rolf E

2013-03-15

This study presents some optical properties of TNT (2,4,6-trinitrotoluene), RDX, HMX and tetryl, specifically their absorption spectra as a function of concentration in various solvents in the ultraviolet and visible portion of the electromagnetic spectrum. We utilize a standoff explosives detection method, called differential reflectometry (DR). TNT was diluted in six different solvents (acetone, acetonitrile, ethanol, ethyl acetate, methanol, and toluene), which allowed for a direct comparison of absorption features over a wide range of concentrations. A line-shape analysis was adopted with great accuracy (R(2)>0.99) to model the absorption features of TNT in differential reflectivity spectra. We observed a blue shift in the pertinent absorption band with decreasing TNT concentration for all solvents. Moreover, using this technique, it was found that for all utilized solvents the concentration of TNT as well as of RDX, HMX, and tetryl, measured as a function of the transition wavelength of the ultra-violet absorption edge in differential reflectivity spectra shows three distinct regions. A model is presented to explain this behavior which is based on intermolecular hydrogen bonding of explosives molecules with themselves (or lack thereof) at different concentrations. Other intermolecular forces such as dipole-dipole interactions, London dispersion forces and π-stacking contribute to slight variations in the resulting spectra, which were determined to be rather insignificant in comparison to hydrogen bonding. The results are aimed towards a better understanding of the DR spectra of explosives energetic materials. Copyright © 2012 Elsevier B.V. All rights reserved.

Pharmacognostical and Phytochemical Studies of Helleborus niger L Root.

PubMed

Kumar, V Kishor; Lalitha, K G

2017-01-01

Helleborus niger L (Ranunculaceae) is used Ayurvedic and Unani systems and other herbal medicine systems. The roots of H. niger have a good medicinal value. To conduct a pharmacognostical and phytochemical study of H. niger . The pharmacognostical studies on roots including parameters such as taxonomical, macroscopic, microscopic characters, physico-chemical, ultra-violet analysis and phytochemical studies are established. Macroscopically, the roots are brownish-black in colour, cylindrical in shape, feeble odour, slightly acrid taste with irregularly branched. Microscopically the root showed the presence of epidermis, air-chambers, fissure periderm, periderm, inner cortex, pith, phloem, xylem, vessels and xylem vessels. Microscopic examination of the powder showed the presence of parenchyma cells, parenchyma mass, periderm, cell inclusion, laticifer, lateral wall pith, perforation, xylem bundle and xylem elements. Ultra-violet and ordinary light analyses with different reagents were conducted to identify the drug in powder form. Physico-chemical evaluation established, Ash values - Total, acid insoluble, water soluble and sulphated ash values were 7.3%, 4.1%, 3.7% and 5.2%, respectively. Extractive values - Alcohol soluble, water soluble and ether soluble extractive values were 22.8%, 7.4% and 5.6%, respectively. Loss on drying was 3.3%. Preliminary phytochemical screening showed the presence of carbohydrate, glycoside, saponins, flavonoid, phytosterols, tannins and phenolic compounds. The results of the study can serve as a valuable resource of pharmacognostic and phytochemical information. This will serve as appropriate, standards for discovery of this plant material in future investigations and applications and also contribute towards establishing pharmacopoeial standards.

Simultaneous Determination of Six Benzodiazepines in Spiked Soft Drinks by High Performance Liquid Chromatography with Ultra Violet Detection (HPLC-UV)

PubMed Central

Soltaninejad, Kambiz; Karimi, Mohammad; Nateghi, Alireza; Daraei, Bahram

2016-01-01

A high performance liquid chromatographic method with ultra violet detection for simultaneous analysis of six benzodiazepines (BZDs) (chlordiazepoxide, diazepam, clonazepam, midazolam , flurazpam, and lorazepam) has been developed for forensic screening of adulterated non-alcoholic drinks. Samples were analyzed after a simple procedure for preparation using pH adjustment and filtering. Isocratic elution on a C18 column (250mm × 4.6 mm, 5μm) in the temperature 45ºC with a mobile phase consisting of 15mM phosphate buffer: methanol (50:50 v/v) at a flow rate 1.4 mL/min has been done. The column eluent was monitored with a UV detector at 245 nm. This allowed a rapid detection and identification as well as quantization of the eluting peaks. Calibration curves for all drugs in the range of 0.5- 10 µg/ mL that all the linear regression and has more than 0.996. Recovery rates for the BZDs were in the range 93.7- 108.7%. The limits of detection were calculated between 0.01- 0.02 µg/ mL. Also, the limits of quantification were 0.03- 0.05 µg/mL. Within-day and between -day coefficient of variation for all BZDs at all concentrations in the range of 0.45 - 7.69 % was calculated. The procedure can provide a simple, sensitive and fast method for the screening of six BZDs in adulterated soft drinks in forensic analysis. PMID:27642316

N and Cr ion implantation of natural ruby surfaces and their characterization

NASA Astrophysics Data System (ADS)

Rao, K. Sudheendra; Sahoo, Rakesh K.; Dash, Tapan; Magudapathy, P.; Panigrahi, B. K.; Nayak, B. B.; Mishra, B. K.

2016-04-01

Energetic ions of N and Cr were used to implant the surfaces of natural rubies (low aesthetic quality). Surface colours of the specimens were found to change after ion implantation. The samples without and with ion implantation were characterized by diffuse reflectance spectra in ultra violet and visible region (DRS-UV-Vis), field emission scanning electron microscopy (FESEM), selected area electron diffraction (SAED) and nano-indentation. While the Cr-ion implantation produced deep red surface colour (pigeon eye red) in polished raw sample (without heat treatment), the N-ion implantation produced a mixed tone of dark blue, greenish blue and violet surface colour in the heat treated sample. In the case of heat treated sample at 3 × 1017 N-ions/cm2 fluence, formation of colour centres (F+, F2, F2+ and F22+) by ion implantation process is attributed to explain the development of the modified surface colours. Certain degree of surface amorphization was observed to be associated with the above N-ion implantation.

Opto-electronic device for frequency standard generation and terahertz-range optical demodulation based on quantum interference

DOEpatents

Georgiades, Nikos P.; Polzik, Eugene S.; Kimble, H. Jeff

1999-02-02

An opto-electronic system and technique for comparing laser frequencies with large frequency separations, establishing new frequency standards, and achieving phase-sensitive detection at ultra high frequencies. Light responsive materials with multiple energy levels suitable for multi-photon excitation are preferably used for nonlinear mixing via quantum interference of different excitation paths affecting a common energy level. Demodulation of a carrier with a demodulation frequency up to 100's THZ can be achieved for frequency comparison and phase-sensitive detection. A large number of materials can be used to cover a wide spectral range including the ultra violet, visible and near infrared regions. In particular, absolute frequency measurement in a spectrum from 1.25 .mu.m to 1.66 .mu.m for fiber optics can be accomplished with a nearly continuous frequency coverage.

Planetary nebulae with UVIT: Far ultra-violet halo around the Bow Tie nebula (NGC 40)

NASA Astrophysics Data System (ADS)

Kameswara Rao, N.; Sutaria, F.; Murthy, J.; Krishna, S.; Mohan, R.; Ray, A.

2018-01-01

Context. NGC 40 is a planetary nebula with diffuse X-ray emission, suggesting an interaction of the high-speed wind from WC8 central star (CS) with the nebula. It shows strong C IV 1550 Å emission that cannot be explained by thermal processes alone. We present here the first map of this nebula in C IV emission using broad band filters on the Ultra-Violet Imaging Telescope (UVIT). Aim. We aim to map the hot C IV-emitting gas and its correspondence with soft X-ray (0.3-8 keV) emitting regions in order to study the shock interaction between the nebula and the ISM. We also aim to illustrate the potential of UVIT for nebular studies. Methods: We carry out a morphological study of images of the nebula obtained at an angular resolution of about 1.3″ in four UVIT filter bands that include C IV 1550 Å and [C II] 2326 Å lines as well as UV continuum. We also make comparisons with X-ray, optical, and IR images from the literature. Results: The [C II] 2326 Å images show the core of the nebula with two lobes on either side of CS similar to [N II]. The C IV emission in the core shows similar morphology and extent to that of diffuse X-ray emission concentrated in nebular condensations. A surprising UVIT discovery is the presence of a large faint far UV (FUV) halo in an FUV filter with λeff of 1608 Å. The UV halo is not present in any other UV filter. The FUV halo is most likely due to UV fluorescence emission from the Lyman bands of H2 molecules. Unlike the optical and IR halo, the FUV halo trails predominantly towards the south-east side of the nebular core, opposite to the CS's proper motion direction. Conclusions: Morphological similarity of C IV 1550 Å and X-ray emission in the core suggests that it results mostly from the interaction of strong CS wind with the nebula. The FUV halo in NGC 40 highlights the extensive existence of H2 molecules in the regions even beyond the optical and IR halos. Thus UV studies are important to estimate the amount of H2, which is probably the most dominant molecule and significant for mass-loss studies. Based on data obtained with the Ultra-Violet Imaging Telescope (UVIT) on the ASTROSAT satellite.

Fringe stabilizers and their application to telecommunication device manufacturing

NASA Astrophysics Data System (ADS)

Odhner, Jefferson E.

2000-10-01

The ability to create stable holographic grating is an important part of the production of many telecommunication products. The stability problem is increased by the need to use ultra-violet light for close fringe spacing and long exposure times on phot-resist - a relatively low sensitivity material. Active fringe locking increases the modulation depth and efficiency of these holographic gratings. A discussion of how fringe lockers work and how they can be incorporated into a manufacturing set-up is followed by results of using fringe lockers in the manufacturing of some telecommunication devices.

Naked singularities are not singular in distorted gravity

NASA Astrophysics Data System (ADS)

Garattini, Remo; Majumder, Barun

2014-07-01

We compute the Zero Point Energy (ZPE) induced by a naked singularity with the help of a reformulation of the Wheele-DeWitt equation. A variational approach is used for the calculation with Gaussian Trial Wave Functionals. The one loop contribution of the graviton to the ZPE is extracted keeping under control the UltraViolet divergences by means of a distorted gravitational field. Two examples of distortion are taken under consideration: Gravity's Rainbow and Noncommutative Geometry. Surprisingly, we find that the ZPE is no more singular when we approach the singularity.

STEREO's Extreme UltraViolet Imager (EUVI)

NASA Technical Reports Server (NTRS)

2007-01-01

At a pixel resolution of 2048x2048, the STEREO EUVI instrument provides views of the Sun in ultraviolet light that rivals the full-disk views of SOHO/EIT. This image is through the 171 Angstrom (ultraviolet) filter which is characteristic of iron ions (missing eight and nine electrons) at 1 million degrees. There is a short data gap in the latter half of the movie that creates a freeze and then jump in the data view. This is a movie of the Sun in 171 Angstrom ultraviolet light. The time frame is late January, 2007

Two normal incidence collimators designed for the calibration of the extreme ultraviolet explorer

NASA Technical Reports Server (NTRS)

Jelinsky, Sharon R.; Welsh, Barry; Jelinsky, Patrick; Spiller, Eberhard

1988-01-01

Two Dall-Kirkham, normal incidence collimators have been designed to calibrate the imaging properties of the Extreme Ultraviolet Explorer over the wavelength region from 114 to 2000 A. The mirrors of the short-wavelength, 25-cm diameter collimator are superpolished Zerodur which have been multilayer coated for optimal reflectivity at 114 A. The mirrors of the long-wavelength, 41.25-cm diameter collimator are gold coated Zerodur for high reflectance above 300 A. The design, performance, and future use of these collimators in the extreme ultra-violet is discussed.

Design and demonstration of ultra-wide bandgap AlGaN tunnel junctions

DOE Office of Scientific and Technical Information (OSTI.GOV)

Zhang, Yuewei; Krishnamoorthy, Sriram; Akyol, Fatih

Ultra violet light emitting diodes (UV LEDs) face critical limitations in both the injection efficiency and the light extraction efficiency due to the resistive and absorbing p-type contact layers. In this work, we investigate the design and application of polarization engineered tunnel junctions for ultra-wide bandgap AlGaN (Al mole fraction >50%) materials towards highly efficient UV LEDs. We demonstrate that polarization-induced three dimensional charge is beneficial in reducing tunneling barriers especially for high composition AlGaN tunnel junctions. In addition, the design of graded tunnel junction structures could lead to low tunneling resistance below 10 –3 Ω cm 2 and lowmore » voltage consumption below 1 V (at 1 kA/cm 2) for high composition AlGaN tunnel junctions. Experimental demonstration of 292 nm emission was achieved through non-equilibrium hole injection into wide bandgap materials with bandgap energy larger than 4.7 eV, and detailed modeling of tunnel junctions shows that they can be engineered to have low resistance and can enable efficient emitters in the UV-C wavelength range.« less

Design and demonstration of ultra-wide bandgap AlGaN tunnel junctions

DOE PAGES

Zhang, Yuewei; Krishnamoorthy, Sriram; Akyol, Fatih; ...

2016-09-19

Ultra violet light emitting diodes (UV LEDs) face critical limitations in both the injection efficiency and the light extraction efficiency due to the resistive and absorbing p-type contact layers. In this work, we investigate the design and application of polarization engineered tunnel junctions for ultra-wide bandgap AlGaN (Al mole fraction >50%) materials towards highly efficient UV LEDs. We demonstrate that polarization-induced three dimensional charge is beneficial in reducing tunneling barriers especially for high composition AlGaN tunnel junctions. In addition, the design of graded tunnel junction structures could lead to low tunneling resistance below 10 –3 Ω cm 2 and lowmore » voltage consumption below 1 V (at 1 kA/cm 2) for high composition AlGaN tunnel junctions. Experimental demonstration of 292 nm emission was achieved through non-equilibrium hole injection into wide bandgap materials with bandgap energy larger than 4.7 eV, and detailed modeling of tunnel junctions shows that they can be engineered to have low resistance and can enable efficient emitters in the UV-C wavelength range.« less

Anti-parallel EUV Flows Observed along Active Region Filament Threads with Hi-C

NASA Astrophysics Data System (ADS)

Alexander, Caroline E.; Walsh, Robert W.; Régnier, Stéphane; Cirtain, Jonathan; Winebarger, Amy R.; Golub, Leon; Kobayashi, Ken; Platt, Simon; Mitchell, Nick; Korreck, Kelly; DePontieu, Bart; DeForest, Craig; Weber, Mark; Title, Alan; Kuzin, Sergey

2013-09-01

Plasma flows within prominences/filaments have been observed for many years and hold valuable clues concerning the mass and energy balance within these structures. Previous observations of these flows primarily come from Hα and cool extreme-ultraviolet (EUV) lines (e.g., 304 Å) where estimates of the size of the prominence threads has been limited by the resolution of the available instrumentation. Evidence of "counter-steaming" flows has previously been inferred from these cool plasma observations, but now, for the first time, these flows have been directly imaged along fundamental filament threads within the million degree corona (at 193 Å). In this work, we present observations of an AR filament observed with the High-resolution Coronal Imager (Hi-C) that exhibits anti-parallel flows along adjacent filament threads. Complementary data from the Solar Dynamics Observatory (SDO)/Atmospheric Imaging Assembly (AIA) and Helioseismic and Magnetic Imager are presented. The ultra-high spatial and temporal resolution of Hi-C allow the anti-parallel flow velocities to be measured (70-80 km s-1) and gives an indication of the resolvable thickness of the individual strands (0.''8 ± 0.''1). The temperature of the plasma flows was estimated to be log T (K) = 5.45 ± 0.10 using Emission Measure loci analysis. We find that SDO/AIA cannot clearly observe these anti-parallel flows or measure their velocity or thread width due to its larger pixel size. We suggest that anti-parallel/counter-streaming flows are likely commonplace within all filaments and are currently not observed in EUV due to current instrument spatial resolution.

Space Environmental Effects on Thermal Control Coatings

NASA Technical Reports Server (NTRS)

OBrien, Susan K.; Workman, Gary L.

1997-01-01

The study of long term near ultra-violet (NUV) effects in a vacuum atmosphere, is a crucial element for space applications. NUV radiation causes significant changes in the reflectance of many coatings and types of materials. An ultra high vacuum NUV system was assembled in order to investigate various coatings and materials in this hostile environment. The vacuum is an ion pump that maintains a minimum vacuum in the mid 10(exp -9) range. The system has a base pressure of 10(exp -9) torr and this base pressure is maintained with the ion pump. The NUV exposure was maintained at 2-3 suns which allows accelerated NUV exposure without overheating the samples. The goal of this test was to maintain an intensity of 3.4 x 10(exp -2) Watts/cm(exp 2) which equals 2.9 NUV suns. An NUV sun is defined as 1.16 Watts/cm(exp 2) integrated over wavelength of 200-400 nanometers.

Opto-electronic device for frequency standard generation and terahertz-range optical demodulation based on quantum interference

DOEpatents

Georgiades, N.P.; Polzik, E.S.; Kimble, H.J.

1999-02-02

An opto-electronic system and technique for comparing laser frequencies with large frequency separations, establishing new frequency standards, and achieving phase-sensitive detection at ultra high frequencies are disclosed. Light responsive materials with multiple energy levels suitable for multi-photon excitation are preferably used for nonlinear mixing via quantum interference of different excitation paths affecting a common energy level. Demodulation of a carrier with a demodulation frequency up to 100`s THZ can be achieved for frequency comparison and phase-sensitive detection. A large number of materials can be used to cover a wide spectral range including the ultra violet, visible and near infrared regions. In particular, absolute frequency measurement in a spectrum from 1.25 {micro}m to 1.66 {micro}m for fiber optics can be accomplished with a nearly continuous frequency coverage. 7 figs.

Scintillation properties of Nd 3+, Tm 3+, and Er 3+ doped LuF 3 scintillators in the vacuum ultra violet region

NASA Astrophysics Data System (ADS)

Yanagida, Takayuki; Kawaguchi, Noriaki; Fukuda, Kentaro; Kurosawa, Shunsuke; Fujimoto, Yutaka; Futami, Yoshisuke; Yokota, Yuui; Taniue, Kojiro; Sekiya, Hiroyuki; Kubo, Hidetoshi; Yoshikawa, Akira; Tanimori, Toru

2011-12-01

In order to develop novel vacuum ultra violet (VUV) emitting scintillators, we grew Nd 0.5%, Tm 0.5%, and Er 0.5% doped LuF3 scintillators by the μ-pulling down method, because LuF3 has a very wide band gap and Nd3+, Tm3+, and Er3+ luminescence centers show fast and intense 5d-4f emission in VUV region. Transmittance and X-ray induced radioluminescence were studied in these three samples using our original spectrometer made by Bunkou-Keiki company. In the VUV region, transmittance of 20-60% was achieved for all the samples. The emission peaks appeared at approximately 180, 165, and 164 nm for Nd3+, Tm3+, and Er3+ doped LuF3, respectively. Using PMT R8778 (Hamamatsu), we measured their light yields under 241Am α-ray excitation. Compared with Nd:LaF3 scintillator, which has 33 photoelectrons/5.5 MeV α, Nd:LuF3 and Tm:LuF3 showed 900±90 and 170±20 ph/5.5 MeV-α, respectively. Only for the Nd doped one, we can detect 137Cs 662 keV γ-ray photoabsorption peak and the light yield of 1200±120 ph/MeV was measured. We also investigated their decay time profiles by picosecond pulse X-ray equipped streak camera, and the main decay component of Nd:LuF3 turned out to be 7.63 ns.

Seasonal and spatial variation of topside He+ column density obtained from Extreme Ultra Violet Imager onboard the International Space Station

NASA Astrophysics Data System (ADS)

Hozumi, Y.; Saito, A.; Murakami, G.; Yamazaki, A.; Yoshikawa, I.

2016-12-01

The seasonal, longitudinal and latitudinal variations of He+ distribution in the topside ionosphere in 2013 are elucidated with data of He+ resonant scattering obtained by Extreme Ultra Violet Imager (EUVI) onboard the International Space Station (ISS). EUVI provides a data set of the column density of He+ above the ISS orbit altitude. The data set provides a unique opportunity to study He+ distribution in the topside ionosphere from a different perspective of past studies using in-situ measurement data. During the solstice seasons, an enhancement of He+ column density in the winter hemisphere is observed. The magnitude of this hemispheric asymmetry shows a longitudinal variability. Around the June solstice, the hemispheric asymmetry was greater in the longitude sector where the geomagnetic declination angle is negative and smaller in the longitude sector where the geomagnetic declination angle is positive. Around the December solstice, on the other hand, this longitudinal variation of the asymmetry magnitude had opposite tendency. The hemispheric asymmetry of the effective neutral wind well explains this behavior of He+. The field-aligned component of neutral wind in the F-region is varied in longitude under the presence of finite geomagnetic declination angle and large zonal wind. In the equinox seasons, two longitudinal maxima were observed at around 140ºE and 30ºE. The longitudinal variation of the effective neutral wind is a candidate of these two maxima of He+ concentration. These results suggest that the transport of ions in the topside ionosphere is strongly affected by the F-region neutral wind.

Global distribution of the He+ column density observed by Extreme Ultra Violet Imager on the International Space Station

NASA Astrophysics Data System (ADS)

Hozumi, Yuta; Saito, Akinori; Yoshikawa, Ichiro; Yamazaki, Atsushi; Murakami, Go; Yoshioka, Kazuo; Chen, Chia-Hung

2017-07-01

The global distribution of He+ in the topside ionosphere was investigated using data of the He+ resonant scattering emission at 30.4 nm obtained by the Extreme Ultra Violet Imager (EUVI) onboard the International Space Station. The optical observation by EUVI from the low-Earth orbit provides He+ column density data above the altitude of 400 km, presenting a unique opportunity to study the He+ distribution with a different perspective from that of past studies using data from in situ measurements. We analyzed data taken in 2013 and elucidated, for the first time, the seasonal, longitudinal, and latitudinal variations of the He+ column density in the dusk sector. It was found that the He+ column density in the winter hemisphere was about twice that in the summer hemisphere. In the December solstice season, the magnitude of this hemispheric asymmetry was large (small) in the longitudinal sector where the geomagnetic declination is eastward (westward). In the June solstice season, this relationship between the He+ distribution and the geomagnetic declination is reversed. In the equinox seasons, the He+ column densities in the two hemispheres are comparable at most longitudes. The seasonal and longitudinal dependence of the hemispheric asymmetry of the He+ distribution was attributed to the geomagnetic meridional neutral wind in the F region ionosphere. The neutral wind effect on the He+ distribution was examined with an empirical neutral wind model, and it was confirmed that the transport of ions in the topside ionosphere is predominantly affected by the F region neutral wind and the geomagnetic configuration.

X ray microscope/telescope test and alignment

NASA Technical Reports Server (NTRS)

Walker, Arthur B. C.; Hoover, Richard B.

1991-01-01

The tasks performed by the Center for Applied Optics (CAO) in support of the Normal Incidence Multilayer X-Ray Optics Program are detailed. The Multi-Spectral Solar Telescope Array (MSSTA) was launched on a Terrier-boosted Black Brant sounding rocket from White Sands Missile Range on 13 May 1991. High resolution images of the sun in the soft x ray to extreme ultraviolet (EUV) regime were obtained with normal-incidence Cassegrain, Ritchey-Chretien, and Herschelian telescopes mounted in the sounding rocket. MSSTA represents the first use of multilayer optics to study a very broad range of x ray and EUV solar emissions. Energy-selective properties of multilayer-coated optics allow distinct groups of emission lines to be isolated in the solar corona and transition region. Features of the near and far coronal structures including magnetic loops of plasmas, coronal plumes, coronal holes, faint structures, and cool prominences are visible in these images. MSSTA successfully obtained unprecedented information regarding the structure and dynamics of the solar atmosphere in the temperature range of 10(exp 4)-10(exp 7) K. The performance of the MSSTA has demonstrated a unique combination of ultra-high spatial resolution and spectral differentiation by use of multilayer optics.

Prospective EUV observations of hot DA white dwarfs with the EUV Explorer

NASA Technical Reports Server (NTRS)

Finley, David S.; Malina, Roger F.; Bowyer, Stuart

1987-01-01

The Extreme Ultraviolet Explorer (EUVE) will perform a high sensitivity EUV all-sky survey. A major category of sources which will be detected with the EUVE instruments consists of hot white dwarfs. Detailed preliminary studies of synthetic EUV observations of white dwarfs have been carried out using the predicted EUVE instrumental response functions. Using available information regarding space densities of white dwarfs and the distribution of neutral hydrogen in the interstellar medium, the numbers of DA white dwarfs which will be detectable in the different EUV bandpasses have been estimated.

Using JWST Heritage to Enable a Future Large Ultra-Violet Optical Infrared Telescope

NASA Technical Reports Server (NTRS)

Feinberg, Lee

2016-01-01

To the extent it makes sense, leverage JWST knowledge, designs, architectures, GSE. Develop a scalable design reference mission (9.2 meter). Do just enough work to understand launch break points in aperture size. Demonstrate 10 pm stability is achievable on a design reference mission. Make design compatible with starshades. While segmented coronagraphs with high throughput and large bandpasses are important, make the system serviceable so you can evolve the instruments. Keep it room temperature to minimize the costs associated with cryo. Focus resources on the contrast problem. Start with the architecture and connect it to the technology needs.

Instrument Design of the Large Aperture Solar UV Visible and IR Observing Telescope (SUVIT) for the SOLAR-C Mission

NASA Astrophysics Data System (ADS)

Suematsu, Y.; Katsukawa, Y.; Shimizu, T.; Ichimoto, K.; Takeyama, N.

2012-12-01

We present an instrumental design of one major solar observation payload planned for the SOLAR-C mission: the Solar Ultra-violet Visible and near IR observing Telescope (SUVIT). The SUVIT is designed to provide high-angular-resolution investigation of the lower solar atmosphere, from the photosphere to the uppermost chromosphere, with enhanced spectroscopic and spectro-polarimetric capability in wide wavelength regions from 280 nm (Mg II h&k lines) to 1100 nm (He I 1083 nm line) with 1.5 m class aperture and filtergraphic and spectrographic instruments.

Durable silver mirror with ultra-violet thru far infra-red reflection

DOEpatents

Wolfe, Jesse D.

2010-11-23

A durable highly reflective silver mirror characterized by high reflectance in a broad spectral range of about 300 nm in the UV to the far infrared (.about.10000 nm), as well as exceptional environmental durability. A high absorptivity metal underlayer is used which prevents the formation of a galvanic cell with a silver layer while increasing the reflectance of the silver layer. Environmentally durable overcoat layers are provided to enhance mechanical and chemical durability and protect the silver layer from corrosion and tarnishing, for use in a wide variety of surroundings or climates, including harsh or extreme environments.

A Fourier transform spectrometer for visible and near ultra-violet measurements of atmospheric absorption

NASA Technical Reports Server (NTRS)

Parsons, C. L.; Gerlach, J. C.; Whitehurst, M.

1982-01-01

The development of a prototype, ground-based, Sun-pointed Michelson interferometric spectrometer is described. Its intended use is to measure the atmospheric amount of various gases which absorb in the near-infrared, visible, and near-ultraviolet portions of the electromagnetic spectrum. Preliminary spectra which contain the alpha, 0.8 micrometer, and rho sigma tau water vapor absorption bands in the near-infrared are presented to indicate the present capability of the system. Ultimately, the spectrometer can be used to explore the feasible applications of Fourier transform spectroscopy in the ultraviolet where grating spectrometers were used exclusively.

193nm high power lasers for the wide bandgap material processing

NASA Astrophysics Data System (ADS)

Fujimoto, Junichi; Kobayashi, Masakazu; Kakizaki, Koji; Oizumi, Hiroaki; Mimura, Toshio; Matsunaga, Takashi; Mizoguchi, Hakaru

2017-02-01

Recently infrared laser has faced resolution limit of finer micromachining requirement on especially semiconductor packaging like Fan-Out Wafer Level Package (FO-WLP) and Through Glass Via hole (TGV) which are hard to process with less defect. In this study, we investigated ablation rate with deep ultra violet excimer laser to explore its possibilities of micromachining on organic and glass interposers. These results were observed with a laser microscopy and Scanning Electron Microscope (SEM). As the ablation rates of both materials were quite affordable value, excimer laser is expected to be put in practical use for mass production.

[Effects of covering the windowpane with plastic film on microclimate and sunshine of the living room in a cold region].

PubMed

Peng, G H

1990-05-01

Experiments were made to ascertain the effects of covering windowpane with plastic film in Hulunbeir region on microclimate and sunshine intensity in the living room. It was found that a good regulative effect on the room microclimate resulted by covering the windowpane with plastic film in the cold region. The room temperature rose distinctly. No evident effects were found on ultra-violet radiation and illumination. But the concentration of carbon dioxide increased to some extent. Attention should be paid to ventilation of the room.

ANTI-PARALLEL EUV FLOWS OBSERVED ALONG ACTIVE REGION FILAMENT THREADS WITH HI-C

DOE Office of Scientific and Technical Information (OSTI.GOV)

Alexander, Caroline E.; Walsh, Robert W.; Régnier, Stéphane

Plasma flows within prominences/filaments have been observed for many years and hold valuable clues concerning the mass and energy balance within these structures. Previous observations of these flows primarily come from Hα and cool extreme-ultraviolet (EUV) lines (e.g., 304 Å) where estimates of the size of the prominence threads has been limited by the resolution of the available instrumentation. Evidence of 'counter-steaming' flows has previously been inferred from these cool plasma observations, but now, for the first time, these flows have been directly imaged along fundamental filament threads within the million degree corona (at 193 Å). In this work, wemore » present observations of an AR filament observed with the High-resolution Coronal Imager (Hi-C) that exhibits anti-parallel flows along adjacent filament threads. Complementary data from the Solar Dynamics Observatory (SDO)/Atmospheric Imaging Assembly (AIA) and Helioseismic and Magnetic Imager are presented. The ultra-high spatial and temporal resolution of Hi-C allow the anti-parallel flow velocities to be measured (70-80 km s{sup –1}) and gives an indication of the resolvable thickness of the individual strands (0.''8 ± 0.''1). The temperature of the plasma flows was estimated to be log T (K) = 5.45 ± 0.10 using Emission Measure loci analysis. We find that SDO/AIA cannot clearly observe these anti-parallel flows or measure their velocity or thread width due to its larger pixel size. We suggest that anti-parallel/counter-streaming flows are likely commonplace within all filaments and are currently not observed in EUV due to current instrument spatial resolution.« less

Ultra-sensitive EUV resists based on acid-catalyzed polymer backbone breaking

NASA Astrophysics Data System (ADS)

Manouras, Theodoros; Kazazis, Dimitrios; Koufakis, Eleftherios; Ekinci, Yasin; Vamvakaki, Maria; Argitis, Panagiotis

2018-03-01

The main target of the current work was to develop new sensitive polymeric materials for lithographic applications, focusing in particular to EUV lithography, the main chain of which is cleaved under the influence of photogenerated acid. Resist materials based on the cleavage of polymer main chain are in principle capable to create very small structures, to the dimensions of the monomers that they consist of. Nevertheless, in the case of the commonly used nonchemically amplified materials of this type issues like sensitivity and poor etch resistance limit their areas of application, whereas inadequate etch resistance and non- satisfactory process reliability are the usual problems encountered in acid catalysed materials based on main chain scission. In our material design the acid catalyzed chain cleavable polymers contain very sensitive moieties in their backbone while they remain intact in alkaline ambient. These newly synthesized polymers bear in addition suitable functional groups for the achievement of desirable lithographic characteristics (thermal stability, acceptable glass transition temperature, etch resistance, proper dissolution behavior, adhesion to the substrate). Our approach for achieving acceptable etch resistance, a main drawback in other main chain cleavable resists, is based on the introduction of polyaromatic hydrocarbons in the polymeric backbone, whereas the incorporation of an inorganic component further enhances the etch resistance. Single component systems can also be designed following the proposed approach by the incorporation of suitable PAGs and base quencher molecules in the main chain. Resist formulations based on a random copolymer designed according to the described rules evaluated in EUV exhibit ultrahigh sensitivity, capability for high resolution patterning and overall processing characteristics that make them strong candidates for industrial use upon further optimization.

Effect of SPM-based cleaning POR on EUV mask performance

NASA Astrophysics Data System (ADS)

Choi, Jaehyuck; Lee, Han-shin; Yoon, Jinsang; Shimomura, Takeya; Friz, Alex; Montgomery, Cecilia; Ma, Andy; Goodwin, Frank; Kang, Daehyuk; Chung, Paul; Shin, Inkyun; Cho, H.

2011-11-01

EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality and patterning performance can change during mask fabrication, EUV exposure, maintenance cleaning, shipping, or storage. The fact that a pellicle is not used to protect the mask surface in EUV lithography suggests that EUV masks may have to undergo more cleaning cycles during their lifetime. More frequent cleaning, combined with the adoption of new materials for EUV masks, necessitates that mask manufacturers closely examine the performance change of EUV masks during cleaning process. We have investigated EUV mask quality and patterning performance during 30 cycles of Samsung's EUV mask SPM-based cleaning and 20 cycles of SEMATECH ADT exposure. We have observed that the quality and patterning performance of EUV masks does not significantly change during these processes except mask pattern CD change. To resolve this issue, we have developed an acid-free cleaning POR and substantially improved EUV mask film loss compared to the SPM-based cleaning POR.

Film loss-free cleaning chemicals for EUV mask lifetime elongation developed through combinatorial chemical screening

NASA Astrophysics Data System (ADS)

Choi, Jaehyuck; Kim, Jinsu; Lowe, Jeff; Dattilo, Davide; Koh, Soowan; Choi, Jun Yeol; Dietze, Uwe; Shoki, Tsutomu; Kim, Byung Gook; Jeon, Chan-Uk

2015-10-01

EUV masks include many different layers of various materials rarely used in optical masks, and each layer of material has a particular role in enhancing the performance of EUV lithography. Therefore, it is crucial to understand how the mask quality and patterning performance can change during mask fabrication, EUV exposure, maintenance cleaning, shipping, or storage. SPM (Sulfuric acid peroxide mixture) which has been extensively used for acid cleaning of photomask and wafer has serious drawback for EUV mask cleaning. It shows severe film loss of tantalum-based absorber layers and limited removal efficiency of EUV-generated carbon contaminants on EUV mask surface. Here, we introduce such novel cleaning chemicals developed for EUV mask as almost film loss free for various layers of the mask and superior carbon removal performance. Combinatorial chemical screening methods allowed us to screen several hundred combinations of various chemistries and additives under several different process conditions of temperature and time, eventually leading to development of the best chemistry selections for EUV mask cleaning. Recently, there have been many activities for the development of EUV pellicle, driven by ASML and core EUV scanner customer companies. It is still important to obtain film-loss free cleaning chemicals because cleaning cycle of EUV mask should be much faster than that of optic mask mainly due to EUV pellicle lifetime. More frequent cleaning, combined with the adoption of new materials for EUV masks, necessitates that mask manufacturers closely examine the performance change of EUV masks during cleaning process. We have investigated EUV mask quality changes and film losses during 50 cleaning cycles using new chemicals as well as particle and carbon contaminant removal characteristics. We have observed that the performance of new chemicals developed is superior to current SPM or relevant cleaning chemicals for EUV mask cleaning and EUV mask lifetime elongation.

Polishability of thin electrolytic and electroless NiP layers

NASA Astrophysics Data System (ADS)

Kinast, Jan; Beier, Matthias; Gebhardt, Andreas; Risse, Stefan; Tünnermann, Andreas

2015-10-01

Ultra-precise metal optics are key components of sophisticated scientific instrumentation in astronomy and space applications, covering a wide spectral range. Especially for applications in the visible or ultra-violet spectral ranges, a low roughness of the optics is required. Therefore, a polishable surface is necessary. State of the art is an amorphous nickel-phosphorus (NiP) layer, which enables several polishing techniques achieving a roughness of <1 nm RMS. Typically, these layers are approximately 30 μm to 60 μm thick. Deposited on Al6061, the bimetallic effect leads to a restricted operational temperature, caused by different coefficients of thermal expansion of Al6061 and NiP. Thinner NiP layers reduce the bimetallic effect. Hence, the possible operating temperature range. A deterministic shape correction via Magnetorheological Finishing of the substrate Al6061 leads to low shape deviations prior to the NiP deposition. This allows for depositing thin NiP-layers, which are polishable via a chemical mechanical polishing technique aiming at ultra-precise metal optics. The present article shows deposition processes and polishability of electroless and electrolytic NiP layers with thicknesses between 1 μm and 10 μm.

X-ray/EUV optics for astronomy, microscopy, polarimetry, and projection lithography; Proceedings of the Meeting, San Diego, CA, July 9-13, 1990

NASA Technical Reports Server (NTRS)

Hoover, Richard B. (Editor); Walker, Arthur B. C., Jr. (Editor)

1991-01-01

Topics discussed in this issue include the fabrication of multilayer X-ray/EUV coatings; the design, characterization, and test of multilayer X-ray/EUV coatings; multilayer X-ray/EUV monochromators and imaging microscopes; X-ray/EUV telescopes; the test and calibration performance of X-ray/EUV instruments; XUV/soft X-ray projection lithography; X-ray/EUV space observatories and missions; X-ray/EUV telescopes for solar research; X-ray/EUV polarimetry; X-ray/EUV spectrographs; and X-ray/EUV filters and gratings. Papers are presented on the deposition-controlled uniformity of multilayer mirrors, interfaces in Mo/Si multilayers, the design and analysis of an aspherical multilayer imaging X-ray microscope, recent developments in the production of thin X-ray reflecting foils, and the ultraprecise scanning technology. Consideration is also given to an active sun telescope array, the fabrication and performance at 1.33 nm of a 0.24-micron-period multilayer grating, a cylindrical proportional counter for X-ray polarimetry, and the design and analysis of the reflection grating arrays for the X-Ray Multi-Mirror Mission.

Initial experimental demonstration of the principles of a xenon gas shield designed to protect optical components from soft x-ray induced opacity (blanking) in high energy density experiments

DOE Office of Scientific and Technical Information (OSTI.GOV)

Swadling, G. F.; Ross, J. S.; Manha, D.

The design principles of a xenon gas shield device that is intended to protect optical components from x-ray induced opacity (“x-ray blanking”) have been experimentally demonstrated at the OMEGA-60 Laser Facility at the Laboratory for Laser Energetics, University of Rochester. A volume of xenon gas placed in front of an optical component absorbs the incoming soft x-ray radiation but transmits optical and ultra-violet radiation. The time-resolved optical (532 nm) transmission of samples was recorded as they were exposed to soft x-rays produced by a gold sphere source (1.5 kJ sr $-$1, 250–300 eV). Blanking of fused silica (SiO 2) wasmore » measured to occur over a range of time-integrated soft x-ray (<3 keV) fluence from ~0.2–2.5 J cm $-$2. A shield test device consisting of a 30 nm silicon nitride (Si 3N 4) and a 10 cm long volume of 0.04 bar xenon gas succeeded in delaying loss of transmission through a magnesium fluoride sample; optical transmission was observed over a longer period than for the unprotected sample. It is hoped that the design of this x-ray shield can be scaled in order to produce a shield device for the National Ignition Facility optical Thomson scattering collection telescope, in order to allow measurements of hohlraum plasma conditions produced in inertial confinement fusion experiments. Finally, if successful, it will also have applications in many other high energy density experiments where optical and ultra-violet measurements are desirable.« less

Is ultra-violet radiation the main force shaping molecular evolution of varicella-zoster virus?

PubMed Central

2011-01-01

Background Varicella (chickenpox) exhibits a characteristic epidemiological pattern which is associated with climate. In general, primary infections in tropical regions are comparatively less frequent among children than in temperate regions. This peculiarity regarding varicella-zoster virus (VZV) infection among certain age groups in tropical regions results in increased susceptibility during adulthood in these regions. Moreover, this disease shows a cyclic behavior in which the number of cases increases significantly during winter and spring. This observation further supports the participation of environmental factors in global epidemiology of chickenpox. However, the underlying mechanisms responsible for this distinctive disease behavior are not understood completely. In a recent publication, Philip S. Rice has put forward an interesting hypothesis suggesting that ultra-violet (UV) radiation is the major environmental factor driving the molecular evolution of VZV. Discussion While we welcomed the attempt to explain the mechanisms controlling VZV transmission and distribution, we argue that Rice's hypothesis takes lightly the circulation of the so called "temperate VZV genotypes" in tropical regions and, to certain degree, overlooks the predominance of such lineages in certain non-temperate areas. Here, we further discuss and present new information about the overwhelming dominance of temperate VZV genotypes in Mexico regardless of geographical location and climate. Summary UV radiation does not satisfactorily explain the distribution of VZV genotypes in different tropical and temperate regions of Mexico. Additionally, the cyclic behavior of varicella does not shown significant differences between regions with different climates in the country. More studies should be conducted to identify the factors directly involved in viral spreading. A better understanding of the modes of transmissions exploited by VZV and their effect on viral fitness is likely to facilitate the implementation of preventive measures for disease control. PMID:21794170

A Hot Companion to a Blue Straggler in NGC 188 as Revealed by the Ultra-Violet Imaging Telescope (UVIT) on ASTROSAT

NASA Astrophysics Data System (ADS)

Subramaniam, Annapurni; Sindhu, N.; Tandon, S. N.; Kameswara Rao, N.; Postma, J.; Côté, Patrick; Hutchings, J. B.; Ghosh, S. K.; George, K.; Girish, V.; Mohan, R.; Murthy, J.; Sankarasubramanian, K.; Stalin, C. S.; Sutaria, F.; Mondal, C.; Sahu, S.

2016-12-01

We present early results from the Ultra-Violet Imaging Telescope (UVIT) on board the ASTROSAT observatory. We report the discovery of a hot companion associated with one of the blue straggler stars (BSSs) in the old open cluster, NGC 188. Using fluxes measured in four filters in UVIT’s far-UV (FUV) channel, and two filters in the near-UV (NUV) channel, we have constructed the spectral energy distribution (SED) of the star WOCS-5885, after combining with flux measurements from GALEX, Ultraviolet Imaging Telescope, Ultraviolet Optical Telescope, SPITZER, WISE, and several ground-based facilities. The resulting SED spans a wavelength range of 0.15 μm to 7.8 μm. This object is found to be one of the brightest FUV sources in the cluster. An analysis of the SED reveals the presence of two components. The cooler component is found to have a temperature of 6000 ± 150 K, confirming that it is a BSS. Assuming it to be a main-sequence star, we estimate its mass to be ˜1.1-1.2 M ⊙. The hotter component, with an estimated temperature of 17,000 ± 500 K, has a radius of ˜ 0.6 R ⊙ and L ˜30 L ⊙. Bigger and more luminous than a white dwarf, yet cooler than a sub-dwarf, we speculate that it is a post-AGB/HB star that has recently transferred its mass to the BSS, which is known to be a rapid rotator. This binary system, which is the first BSS with a post-AGB/HB companion identified in an open cluster, is an ideal laboratory to study the process of BSS formation via mass transfer.

Initial experimental demonstration of the principles of a xenon gas shield designed to protect optical components from soft x-ray induced opacity (blanking) in high energy density experiments

DOE PAGES

Swadling, G. F.; Ross, J. S.; Manha, D.; ...

2017-03-16

The design principles of a xenon gas shield device that is intended to protect optical components from x-ray induced opacity (“x-ray blanking”) have been experimentally demonstrated at the OMEGA-60 Laser Facility at the Laboratory for Laser Energetics, University of Rochester. A volume of xenon gas placed in front of an optical component absorbs the incoming soft x-ray radiation but transmits optical and ultra-violet radiation. The time-resolved optical (532 nm) transmission of samples was recorded as they were exposed to soft x-rays produced by a gold sphere source (1.5 kJ sr $-$1, 250–300 eV). Blanking of fused silica (SiO 2) wasmore » measured to occur over a range of time-integrated soft x-ray (<3 keV) fluence from ~0.2–2.5 J cm $-$2. A shield test device consisting of a 30 nm silicon nitride (Si 3N 4) and a 10 cm long volume of 0.04 bar xenon gas succeeded in delaying loss of transmission through a magnesium fluoride sample; optical transmission was observed over a longer period than for the unprotected sample. It is hoped that the design of this x-ray shield can be scaled in order to produce a shield device for the National Ignition Facility optical Thomson scattering collection telescope, in order to allow measurements of hohlraum plasma conditions produced in inertial confinement fusion experiments. Finally, if successful, it will also have applications in many other high energy density experiments where optical and ultra-violet measurements are desirable.« less

Spectral luminescence analysis of amniotic fluid

NASA Astrophysics Data System (ADS)

Slobozhanina, Ekaterina I.; Kozlova, Nataly M.; Kasko, Leonid P.; Mamontova, Marina V.; Chernitsky, Eugene A.

1997-12-01

It is shown that the amniotic fluid has intensive ultra-violet luminescence caused by proteins. Along with it amniotic fluid radiated in the field of 380 - 650 nm with maxima at 430 - 450 nm and 520 - 560 nm. The first peak of luminescence ((lambda) exc equals 350 nm; (lambda) em equals 430 - 440 nm) is caused (most probably) by the presence in amniotic fluid of some hormones, NADH2 and NADPH2. A more long-wave component ((lambda) exc equals 460 nm; (lambda) em equals 520 - 560 nm) is most likely connected with the presence in amniotic fluid pigments (bilirubin connected with protein and other). It is shown that intensity and maximum of ultra-violet luminescence spectra of amniotic fluid in normality and at pathology are identical. However both emission spectra and excitation spectra of long-wave ((lambda) greater than 450 nm) luminescence of amniotic fluid from pregnant women with such prenatal abnormal developments of a fetus as anencephaly and spina bifida are too long-wave region in comparison with the norm. Results of research testify that spectral luminescent analysis of amniotic fluid can be used for screening of malformations of the neural tube. It is very difficult for a practical obstetrician to reveal pregnant women with a high risk of congenital malformations of the fetus. Apart from ultrasonic examination, cytogenetic examination of amniotic fluid and defumination of concentrations of alpha-fetoprotein and acetylcholin-esterases in the amniotic fluid and blood plasma are the most widely used diagnostic approaches. However, biochemical and cytogenetic diagnostic methods are time-consuming. In the present work spectral luminescence properties of the amniotic fluid are investigated to determine spectral parameters that can be used to reveal pregnant women with a high risk of congenital malformations of their offsprings.

Development of an Ultra-Violet Digital Camera for Volcanic Sulfur Dioxide Imaging

NASA Astrophysics Data System (ADS)

Bluth, G. J.; Shannon, J. M.; Watson, I. M.; Prata, F. J.; Realmuto, V. J.

2006-12-01

In an effort to improve monitoring of passive volcano degassing, we have constructed and tested a digital camera for quantifying the sulfur dioxide (SO2) content of volcanic plumes. The camera utilizes a bandpass filter to collect photons in the ultra-violet (UV) region where SO2 selectively absorbs UV light. SO2 is quantified by imaging calibration cells of known SO2 concentrations. Images of volcanic SO2 plumes were collected at four active volcanoes with persistent passive degassing: Villarrica, located in Chile, and Santiaguito, Fuego, and Pacaya, located in Guatemala. Images were collected from distances ranging between 4 and 28 km away, with crisp detection up to approximately 16 km. Camera set-up time in the field ranges from 5-10 minutes and images can be recorded in as rapidly as 10-second intervals. Variable in-plume concentrations can be observed and accurate plume speeds (or rise rates) can readily be determined by tracing individual portions of the plume within sequential images. Initial fluxes computed from camera images require a correction for the effects of environmental light scattered into the field of view. At Fuego volcano, simultaneous measurements of corrected SO2 fluxes with the camera and a Correlation Spectrometer (COSPEC) agreed within 25 percent. Experiments at the other sites were equally encouraging, and demonstrated the camera's ability to detect SO2 under demanding meteorological conditions. This early work has shown great success in imaging SO2 plumes and offers promise for volcano monitoring due to its rapid deployment and data processing capabilities, relatively low cost, and improved interpretation afforded by synoptic plume coverage from a range of distances.

Specific ultra-violet absorbance as an indicator measurement of merucry sources in an Adirondack River basin

USGS Publications Warehouse

Burns, Douglas A.; Aiken, George R.; Bradley, Paul M.; Journey, Celeste A.; Schelker, Jakob

2013-01-01

The Adirondack region of New York has been identified as a hot spot where high methylmercury concentrations are found in surface waters and biota, yet mercury (Hg) concentrations vary widely in this region. We collected stream and groundwater samples for Hg and organic carbon analyses across the upper Hudson River, a 493 km2 basin in the central Adirondacks to evaluate and model the sources of variation in filtered total Hg (FTHg) concentrations. Variability in FTHg concentrations during the growing seasons (May-Oct) of 2007-2009 in Fishing Brook, a 66-km2 sub-basin, was better explained by specific ultra-violet absorbance at 254 nm (SUVA254), a measure of organic carbon aromaticity, than by dissolved organic carbon (DOC) concentrations, a commonly used Hg indicator. SUVA254 was a stronger predictor of FTHg concentrations during the growing season than during the dormant season. Multiple linear regression models that included SUVA254 values and DOC concentrations could explain 75 % of the variation in FTHg concentrations on an annual basis and 84 % during the growing season. A multiple linear regression landscape modeling approach applied to 27 synoptic sites across the upper Hudson basin found that higher SUVA254 values are associated with gentler slopes, and greater riparian area, and lower SUVA254 values are associated with an increasing influence of open water. We hypothesize that the strong Hg?SUVA254 relation in this basin reflects distinct patterns of FTHg and SUVA254 that are characteristic of source areas that control the mobilization of Hg to surface waters, and that the seasonal influence of these source areas varies in this heterogeneous basin landscape.

Using UV photoaged photography to better understand Western Australian teenagers' attitudes towards adopting sun-protective behaviors.

PubMed

Taylor, Myra F; Westbrook, Dominique; Chang, Paul

2016-02-01

This study aimed to determine whether the viewing of a personal photoaged photograph had the capacity to alter Western Australian teenagers' pro-tanning attitudes. Semi-structured interviews were conducted with fifteen teenagers. The teenagers' pro-tanning attitudes prior to viewing their photoaged photograph are encapsulated in the study's central theme: 'You've got to look after your skin and use sunscreen, but I always forget!'. Post-viewing their photoaged facial image many teenagers reiterated their intentions to adopt (when they remembered) skin-protective measures. However, photoaged photography did not alter other teenagers' intention to tan. NEW KNOWLEDGE: Teenagers who choose to continue to tan were aware of the long-term health risks associated with ultra-violet over-exposure. However, their desire remained strong to emulate the media promoted image of bronzed youth being popular individuals. Indeed, the social benefits of being considered attractive to their peers became an attitudinal barrier to the teenagers' adoption of skin-protective behaviours. Those teenagers who changed their pro-tanning attitudes following their viewing of their ultra-violet photoaged photograph did so because of the shock they received when they saw their sun-damaged facial image. This suggests that photoageing photography can be effective with many adolescents because it reduces the cause-and-effect delay that exists between the occurrence of sun-damage and its visual presentation in later-life. Greater effort needs to be focused on increasing teenagers' understanding of how sun-damage occurs, when it is appropriate to apply sunscreen, as well as in changing the prevailing media image of an attractive body being a tanned body.

Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources

DOEpatents

Kublak, G.D.; Richardson, M.C.

1996-11-19

Method and apparatus for producing extreme ultraviolet (EUV) and soft x-ray radiation from an ultra-low debris plasma source are disclosed. Targets are produced by the free jet expansion of various gases through a temperature controlled nozzle to form molecular clusters. These target clusters are subsequently irradiated with commercially available lasers of moderate intensity (10{sup 11}--10{sup 12} watts/cm{sup 2}) to produce a plasma radiating in the region of 0.5 to 100 nanometers. By appropriate adjustment of the experimental conditions the laser focus can be moved 10--30 mm from the nozzle thereby eliminating debris produced by plasma erosion of the nozzle. 5 figs.

Role of strongly interacting additives in tuning the structure and properties of polymer systems

NASA Astrophysics Data System (ADS)

Daga, Vikram Kumar

Block copolymer (BCP) nanocomposites are an important class of hybrid materials in which the BCP guides the spatial location and the periodic assembly of the additives. High loadings of well-dispersed nanofillers are generally important for many applications including mechanical reinforcing of polymers. In particular the composites shown in this work might find use as etch masks in nanolithography, or for enabling various phase selective reactions for new materials development. This work explores the use of hydrogen bonding interactions between various additives (such as homopolymers and non-polymeric additives) and small, disordered BCPs to cause the formation of well-ordered morphologies with small domains. A detailed study of the organization of homopolymer chains and the evolution of structure during the process of ordering is performed. The results demonstrate that by tuning the selective interaction of the additive with the incorporating phase of the BCP, composites with significantly high loadings of additives can be formed while maintaining order in the BCP morphology. The possibility of high and selective loading of additives in one of the phases of the ordered BCP composite opens new avenues due to high degree of functionalization and the proximity of the additives within the incorporating phase. This aspect is utilized in one case for the formation of a network structure between adjoining additive cores to derive mesoporous inorganic materials with their structures templated by the BCP. The concept of additive-driven assembly is extended to formulate BCPadditive blends with an ability to undergo photo-induced ordering. Underlying this strategy is the ability to transition a weakly interacting additive to its strongly interacting form. This strategy provides an on-demand, non-intrusive route for formation of well-ordered nanostructures in arbitrarily defined regions of an otherwise disordered material. The second area explored in this dissertation deals with the incorporation of additives into photoresists for next generation extreme ultra violet (EUV) photolithography applications. The concept of hydrogen bonding between the additives and the polymeric photoresist was utilized to cause formation of a physical network that is expected to slow down the diffusion of photoacid leading to better photolithographic performance (25-30 nm resolution obtained).

Long-Range Solar Activity Predictions: A Reprieve from Cycle #24's Activity

NASA Technical Reports Server (NTRS)

Richon, K.; Schatten, K.

2003-01-01

We discuss the field of long-range solar activity predictions and provide an outlook into future solar activity. Orbital predictions for satellites in Low Earth Orbit (LEO) depend strongly on exospheric densities. Solar activity forecasting is important in this regard, as the solar ultra-violet (UV) and extreme ultraviolet (EUV) radiations inflate the upper atmospheric layers of the Earth, forming the exosphere in which satellites orbit. Rather than concentrate on statistical, or numerical methods, we utilize a class of techniques (precursor methods) which is founded in physical theory. The geomagnetic precursor method was originally developed by the Russian geophysicist, Ohl, using geomagnetic observations to predict future solar activity. It was later extended to solar observations, and placed within the context of physical theory, namely the workings of the Sun s Babcock dynamo. We later expanded the prediction methods with a SOlar Dynamo Amplitude (SODA) index. The SODA index is a measure of the buried solar magnetic flux, using toroidal and poloidal field components. It allows one to predict future solar activity during any phase of the solar cycle, whereas previously, one was restricted to making predictions only at solar minimum. We are encouraged that solar cycle #23's behavior fell closely along our predicted curve, peaking near 192, comparable to the Schatten, Myers and Sofia (1996) forecast of 182+/-30. Cycle #23 extends from 1996 through approximately 2006 or 2007, with cycle #24 starting thereafter. We discuss the current forecast of solar cycle #24, (2006-2016), with a predicted smoothed F10.7 radio flux of 142+/-28 (1-sigma errors). This, we believe, represents a reprieve, in terms of reduced fuel costs, etc., for new satellites to be launched or old satellites (requiring reboosting) which have been placed in LEO. By monitoring the Sun s most deeply rooted magnetic fields; long-range solar activity can be predicted. Although a degree of uncertainty in the long-range predictions remains, requiring future monitoring, we do not expect the next cycle's + 2-sigma value will rise significantly above solar cycle #23's activity level.

Monitoring Saturn's Upper Atmosphere Density Variations Using Helium 584 Airglow

NASA Astrophysics Data System (ADS)

Parkinson, Chris

2017-10-01

The study of He 584 Å brightnesses is interesting as the EUV (Extreme UltraViolet) planetary airglow have the potential to yield useful information about mixing and other important parameters in its thermosphere. Resonance scattering of sunlight by He atoms is the principal source of the planetary emission of He 585 Å. The principal parameter involved in determining the He 584 Å albedo are the He volume mixing ratio, f_He, well below the homopause. Our main science objective is to estimate the helium mixing ratio in the lower atmosphere. Specifically, He emissions come from above the homopause where optical depth trau=1 in H2 and therefore the interpretation depends mainly on two parameters: He mixing ratio of the lower atmosphere and K_z. The occultations of Koskinen et al (2015) give K_z with an accuracy that has never been possible before and the combination of occultations and airglow therefore provide estimates of the mixing ratio in the lower atmosphere. We make these estimates at several locations that can be reasonably studied with both occultations and airglow and then average the results. Our results lead to a greatly improved estimate of the mixing ratio of He in the upper atmosphere and below. The second objective is to constrain the dynamics in the atmosphere by using the estimate of the He mixing ratio from the main objective. Once we have an estimate of the He mixing ratio in the lower atmosphere that agrees with both occultations and airglow, helium becomes an effective tracer species as any variations in the Cassini UVIS helium data are direct indicator of changes in K_z i.e., dynamics. Our third objective is to connect this work to our Cassini UVIS data He 584 Å airglow analyses as they both cover the time span of the observations and allow us to monitor changes in the airglow observations that may correlate with changes in the state of the atmosphere as revealed by the occultations Saturn's upper thermosphere. This work helps to determine the mixing ratio of He and constrain dynamics in the upper atmosphere, both of which are high level science objectives of the Cassini mission.

Responses of Solar Irradiance and the Ionosphere to an Intense Activity Region

NASA Astrophysics Data System (ADS)

Chen, Yiding; Liu, Libo; Le, Huijun; Wan, Weixing

2018-03-01

Solar rotation (SR) variation dominates solar extremely ultraviolet (EUV) changes on the timescale of days. The F10.7 index is usually used as an indicator for solar EUV. The SR variation of F10.7 significantly enhanced during the 2008th-2009th Carrington rotations (CRs) owing to an intense active region; F10.7 increased about 180 units during that SR period. That was the most prominent SR variation of F10.7 during solar cycle 23. In this paper, global electron content (GEC) is used to investigate ionospheric response to that strong variation of solar irradiance indicated by F10.7. The variation of GEC with F10.7 was anomalous (GEC-F10.7 slope significantly decreased) during the 2008th-2009th CRs; however, GEC versus EUV variation during that period was consistent with that during adjacent time intervals when using Solar Heliospheric Observatory/Solar EUV Monitor 26-34 nm EUV measurements. The reason is that F10.7 response to that intense active region was much stronger than EUV response; thus, the EUV-F10.7 slope decreased. We confirmed decreased EUV-F10.7 slope during the 2008th-2009th CRs for different wavelengths within 27-120 nm using Thermosphere, Ionosphere, Mesosphere Energetics and Dynamics/Solar EUV Experiment high spectral resolution EUV measurements. And on the basis of Solar Heliospheric Observatory/Solar EUV Monitor EUV measurements during solar cycle 23, we further presented that EUV-F10.7 slope statistically tends to decrease when the SR variation of F10.7 significantly enhances. Moreover, we found that ionospheric time lag effect to EUV is exaggerated when using F10.7, owing to the time lag effect of EUV to F10.7.

Observation of EUVL mask using coherent EUV scatterometry microscope with high-harmonic-generation EUV source

NASA Astrophysics Data System (ADS)

Mamezaki, Daiki; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo

2017-07-01

In extreme ultraviolet (EUV) lithography, development of review tools for EUV mask pattern and phase defect at working wavelength of 13.5 nm is required. The EUV mask is composed of an absorber pattern (50 - 70 nm thick) and Mo/Si multilayer (280 nm thick) on a glass substrate. This mask pattern seems three-dimensional (3D) structure. This 3D structure would modulate EUV reflection phase, which would cause focus and pattern shifts. Thus, EUV phase imaging is important to evaluate this phase modulation. We have developed coherent EUV scatterometry microscope (CSM), which is a simple microscope without objective optics. EUV phase and intensity image are reconstructed with diffraction images by ptychography with coherent EUV illumination. The high-harmonic-generation (HHG) EUV source was employed for standalone CSM system. In this study, we updated HHG system of pump-laser reduction and gas-pressure control. Two types of EUV mask absorber patterns were observed. An 88-nm lines-and-spaces and a cross-line patterns were clearly reconstructed by ptychography. In addition, a natural defect with 2-μm diameter on the cross-line was well reconstructed. This demonstrated the high capability of the standalone CSM, which system will be used in the factories, such as mask shops and semiconductor fabrication plants.

Serendipitous EUV sources detected during the first year of the Extreme Ultraviolet Explorer right angle program

NASA Technical Reports Server (NTRS)

Mcdonald, K.; Craig, N.; Sirk, M. M.; Drake, J. J.; Fruscione, A.; Vallerga, J. V.; Malina, R. F.

1994-01-01

We report the detection of 114 extreme ultraviolet (EUV; 58 - 740 A) sources, of which 99 are new serendipitous sources, based on observations made with the imaging telescopes on board the Extreme Ultraviolet Explorer (EUVE) during the Right Angle Program (RAP). These data were obtained using the survey scanners and the Deep Survey instrument during the first year of the spectroscopic guest observer phase of the mission, from January 1993 to January 1994. The data set consists of 162 discrete pointings whose exposure times are typically two orders of magnitude longer than the average exposure times during the EUVE all-sky survey. Based on these results, we can expect that EUVE will serendipitously detect approximately 100 new EUV sources per year, or about one new EUV source per 10 sq deg, during the guest observer phase of the EUVE mission. New EUVE sources of note include one B star and three extragalactic objects. The B star (HR 2875, EUVE J0729 - 38.7) is detected in both the Lexan/B (approximately 100 A) and Al/Ti/C (approximately 200 A) bandpasses, and the detection is shown not to be a result of UV leaks. We suggest that we are detecting EUV and/or soft x rays from a companion to the B star. Three sources, EUVE J2132+10.1, EUVE J2343-14.9, and EUVE J2359-30.6 are identified as the active galactic nuclei MKN 1513, MS2340.9-1511, and 1H2354-315, respectively.

A high-speed pnCCD detector system for optical applications

NASA Astrophysics Data System (ADS)

Hartmann, R.; Buttler, W.; Gorke, H.; Herrmann, S.; Holl, P.; Meidinger, N.; Soltau, H.; Strüder, L.

2006-11-01

Measurements of a frame-store pnCCD detector system, optimized for high-speed applications in the optical and near infrared (NIR) region, will be presented. The device with an image area of 13.5 mm by 13.5 mm and a pixelsize of 51 μm by 51 μm exhibits a readout time faster than 1100 frames per second with an overall electronic noise contribution of less than three electrons. Variable operation modes of the detector system allow for even higher readout speeds by a pixel binning in transfer direction or, at slightly slower readout speeds, a further improvement in noise performance. We will also present the concept of a data acquisition system being able to handle pixel rates of more than 75 megapixel per second. The application of an anti-reflective coating on the ultra-thin entrance window of the back illuminated detector together with the large sensitive volume ensures a high and uniform detection efficiency from the ultra violet to the NIR.

X-ray diffraction gratings: Precise control of ultra-low blaze angle via anisotropic wet etching

DOE Office of Scientific and Technical Information (OSTI.GOV)

Voronov, Dmitriy L.; Naulleau, Patrick; Gullikson, Eric M.

2016-07-25

Diffraction gratings are used from micron to nanometer wavelengths as dispersing elements in optical instruments. At shorter wavelengths, crystals can be used as diffracting elements, but due to the 3D nature of the interaction with light are wavelength selective rather than wavelength dispersing. There is an urgent need to extend grating technology into the x-ray domain of wavelengths from 1 to 0.1 nm, but this requires the use of gratings that have a faceted surface in which the facet angles are very small, typically less than 1°. Small facet angles are also required in the extreme ultra-violet and soft x-ray energymore » ranges in free electron laser applications, in order to reduce power density below a critical damage threshold. In this work, we demonstrate a technique based on anisotropic etching of silicon designed to produce very small angle facets with a high degree of perfection.« less

SUB 1-Millimeter Size Fresnel Micro Spectrometer

NASA Technical Reports Server (NTRS)

Park, Yeonjoon; Koch, Laura; Song, Kyo D.; Park, Sangloon; King, Glen; Choi, Sang

2010-01-01

An ultra-small micro spectrometer with less than 1mm diameter was constructed using Fresnel diffraction. The fabricated spectrometer has a diameter of 750 nmicrometers and a focal length of 2.4 mm at 533nm wavelength. The micro spectrometer was built with a simple negative zone plate that has an opaque center with an ecliptic shadow to remove the zero-order direct beam to the aperture slit. Unlike conventional approaches, the detailed optical calculation indicates that the ideal spectral resolution and resolving power do not depend on the miniaturized size but only on the total number of rings. We calculated 2D and 3D photon distribution around the aperture slit and confirmed that improved micro-spectrometers below 1mm size can be built with Fresnel diffraction. The comparison between mathematical simulation and measured data demonstrates the theoretical resolution, measured performance, misalignment effect, and improvement for the sub-1mm Fresnel micro-spectrometer. We suggest the utilization of an array of micro spectrometers for tunable multi-spectral imaging in the ultra violet range.

Aluminum Mirror Coatings for UVOIR Telescope Optics Including the Far UV

NASA Technical Reports Server (NTRS)

Balasubramanian, Kunjithapatha; Hennessy, John; Raouf, Nasrat; Nikzad, Shouleh; Ayala, Michael; Shaklan, Stuart; Scowen, Paul; Del Hoyo, Javier; Quijada, Manuel

2015-01-01

NASA Cosmic Origins (COR) Program identified the development of high reflectivity mirror coatings for large astronomical telescopes particularly for the far ultra violet (FUV) part of the spectrum as a key technology requiring significant materials research and process development. In this paper we describe the challenges and accomplishments in producing stable high reflectance aluminum mirror coatings with conventional evaporation and advanced Atomic Layer Deposition (ALD) techniques. We present the current status of process development with reflectance of approx. 55 to 80% in the FUV achieved with little or no degradation over a year. Keywords: Large telescope optics, Aluminum mirror, far UV astrophysics, ALD, coating technology development.

In-orbit Calibrations of the Ultraviolet Imaging Telescope

DOE Office of Scientific and Technical Information (OSTI.GOV)

Tandon, S. N.; Subramaniam, Annapurni; Sankarasubramanian, K.

The Ultra-Violet Imaging Telescope (UVIT) is one of the payloads in ASTROSAT, the first Indian Space Observatory. The UVIT instrument has two 375 mm telescopes: one for the far-ultraviolet (FUV) channel (1300–1800 Å), and the other for the near-ultraviolet (NUV) channel (2000–3000 Å) and the visible (VIS) channel (3200–5500 Å). UVIT is primarily designed for simultaneous imaging in the two ultraviolet channels with spatial resolution better than 1.″8, along with provisions for slit-less spectroscopy in the NUV and FUV channels. The results of in-orbit calibrations of UVIT are presented in this paper.

Isolation and identification of three potential impurities of pholcodine bulk drug substance.

PubMed

Denk, O M; Gray, A I; Skellern, G G; Watson, D G

2000-07-01

Three previously unreported manufacturing impurities were isolated from a pholcodine mother liquor using preparative reversed-phase HPLC. The liquor was the residue remaining after recrystallisation of a production batch of pholcodine. The impurities, which are structurally related to pholcodine, were initially detected by thin-layer chromatography (TLC). Their structures were determined after separation by preparative HPLC (Econo-Prep 5 microm C18 column, 30 cm x 21.2 mm i.d.). Structure elucidation was carried out using nuclear magnetic resonance (NMR) spectroscopy, mass spectroscopy (MS) and ultra violet (UV) spectroscopy. The impurities were identified as alkylated derivatives of pholcodine possessing second 2-morpholinoethyl substituents at various positions.

Counter-facing plasma guns for efficient extreme ultra-violet plasma light source

NASA Astrophysics Data System (ADS)

Kuroda, Yusuke; Yamamoto, Akiko; Kuwabara, Hajime; Nakajima, Mitsuo; Kawamura, Tohru; Horioka, Kazuhiko

2013-11-01

A plasma focus system composed of a pair of counter-facing coaxial guns was proposed as a long-pulse and/or repetitive high energy density plasma source. We applied Li as the source of plasma for improvement of the conversion efficiency, the spectral purity, and the repetition capability. For operation of the system with ideal counter-facing plasma focus mode, we changed the system from simple coaxial geometry to a multi-channel configuration. We applied a laser trigger to make synchronous multi-channel discharges with low jitter. The results indicated that the configuration is promising to make a high energy density plasma with high spectral efficiency.

Structural and optical band gap of PEO/PVP polymer blend

NASA Astrophysics Data System (ADS)

Basappa, M.; Yesappa, L.; Niranjana, M.; Ashokkumar, S. P.; Vandana, M.; Vijeth, H.; Devendrappa, H.

2018-05-01

The PEO/PVP polymers blend film at different wt % of PVP is prepared by solution casting method using methanol as a solvent. The blend was characterized by FT-IR to confirm the blend and the peak observed in the region 1230-980 cm-1 corresponds to C-O-C symmetric and asymmetric stretching. The UV-visible absorption shows red shift from 190 to 220 nm in the ultra violet region is attributed to π→π* transition. The direct and indirect optical band gaps were determined and found decreases from 4.99 to 4.62 eV with increased PVP wt % to 50:50.

Laser-induced fluorescence spectrometer based on tunable color center laser for low-impurity-solution diagnostic and analysis

NASA Astrophysics Data System (ADS)

Basiev, Tasoltan T.; Fedorov, Vladimir V.; Karasik, Alexander Y.; Lin'kov, S. I.; Orlovskii, Yurii V.; Osiko, Vyacheslav V.; Panov, Vitaly A.; Prokhorov, Alexander M.; Vorob'ev, Ivan N.; Zverev, Peter G.

1996-11-01

Solid state (SS) tunable LiF:F2 color center laser with second and fourth harmonic generation for visible and ultra violet spectral ranges was developed for the laser induced fluorescence spectroscopy (LIFS). The construction and properties of excitation, registration and flame atomization systems for water solution diagnostic are discussed. The testing experiment with low iron concentrated water sample exhibits ultrahigh sensitivity which was estimated to be 0.05 ppb in our set-up. The SS LIFS spectrometer developed is usable to measure more than 42 metal elements in solution on the ppm, ppb level for various medical and biological applications.

Two dimensional imaging of photoluminescence from rice for quick and non-destructive evaluation

NASA Astrophysics Data System (ADS)

Katsumata, T.; Suzuki, T.; Aizawa, H.; Matashige, E.

2005-05-01

The visible PL with broad peak at wavelength of λ=462 nm are observed from polished rice, flour and corn starch under illumination of ultra-violet (UV) light. PL peaking at λ=462 nm is excited effectively with UV light at λ=365 nm. Peak intensity is found to vary with the source and the breed of the rice specimens. PL images from rice also reveal the uniformity of the rice products. Two-dimensional images of PL, which reavealed the uniformity of rice under UV irradiation, are potentially useful for the evaluation and the quality control of the rice products.

Quantitative Detection of Combustion Species using Ultra-Violet Diode Lasers

NASA Technical Reports Server (NTRS)

Pilgrim, J. S.; Peterson, K. A.

2001-01-01

Southwest Sciences is developing a new microgravity combustion diagnostic based on UV diode lasers. The instrument will allow absolute concentration measurements of combustion species on a variety of microgravity combustion platforms including the Space Station. Our approach uses newly available room temperature UV diode lasers, thereby keeping the instrument compact, rugged and energy efficient. The feasibility of the technique was demonstrated by measurement of CH radicals in laboratory flames. Further progress in fabrication technology of UV diode lasers at shorter wavelengths and higher power will result in detection of transient species in the deeper UV. High sensitivity detection of combustion radicals is provided with wavelength modulation absorption spectroscopy.

Removal of Micrometer Size Morphological Defects and Enhancement of Ultraviolet Emission by Thermal Treatment of Ga-Doped ZnO Nanostructures

PubMed Central

Manzoor, Umair; Kim, Do K.; Islam, Mohammad; Bhatti, Arshad S.

2014-01-01

Mixed morphologies of Ga-doped Zinc Oxide (ZnO) nanostructures are synthesized by vapor transport method. Systematic scanning electron microscope (SEM) studies of different morphologies, after periodic heat treatments, gives direct evidence of sublimation. SEM micrographs give direct evidence that morphological defects of nanostructures can be removed by annealing. Ultra Violet (UV) and visible emission depends strongly on the annealing temperatures and luminescent efficiency of UV emission is enhanced significantly with each subsequent heat treatment. X-Ray diffraction (XRD) results suggest that crystal quality improved by annealing and phase separation may occur at high temperatures. PMID:24489725

Removal of micrometer size morphological defects and enhancement of ultraviolet emission by thermal treatment of Ga-doped ZnO nanostructures.

PubMed

Manzoor, Umair; Kim, Do K; Islam, Mohammad; Bhatti, Arshad S

2014-01-01

Mixed morphologies of Ga-doped Zinc Oxide (ZnO) nanostructures are synthesized by vapor transport method. Systematic scanning electron microscope (SEM) studies of different morphologies, after periodic heat treatments, gives direct evidence of sublimation. SEM micrographs give direct evidence that morphological defects of nanostructures can be removed by annealing. Ultra Violet (UV) and visible emission depends strongly on the annealing temperatures and luminescent efficiency of UV emission is enhanced significantly with each subsequent heat treatment. X-Ray diffraction (XRD) results suggest that crystal quality improved by annealing and phase separation may occur at high temperatures.

Method and tool to reverse the charges in anti-reflection films used for solar cell applications

DOEpatents

Sharma, Vivek; Tracy, Clarence

2017-01-31

A method is provided for making a solar cell. The method includes providing a stack including a substrate, a barrier layer disposed on the substrate, and an anti-reflective layer disposed on the barrier layer, where the anti-reflective layer has charge centers. The method also includes generating a corona with a charging tool and contacting the anti-reflective layer with the corona thereby injecting charge into at least some of the charge centers in the anti-reflective layer. Ultra-violet illumination and temperature-based annealing may be used to modify the charge of the anti-reflective layer.

How does the scorpion Euscorpius flavicaudis (Deg.) manage to survive in Britain?

NASA Astrophysics Data System (ADS)

Cloudsley-Thompson, J. L.; Constantinou, C.

1983-06-01

Field observations at Sheerness suggest that E. flavicaudis is night-active: it fluoresces strongly in ultra-violet light. Aktograph experiments demonstrated a marked circadian rhythm of noctural locomotory activity whose free-running period in constant light is 24.7 h. In darkness, the free-running period is variable. The rate of transpiration is not unduly low compared with that of other scorpions, as might have been expected were E. flavicaudis day-active. It is argued that the survival of this species in southern England does not involve any special physiological adjustments since most if not all species of scorpions are able to withstand freezing temperatures.

Transmittance measurements of ultra violet and visible wavelength interference filters flown aboard LDEF

NASA Technical Reports Server (NTRS)

Mooney, Thomas A.; Smajkiewicz, Ali

1991-01-01

A set of ten interference filters for the UV and VIS spectral region were flown on the surface of the Long Duration Exposure Facility (LDEF) Tray B-8 along with earth radiation budget (ERB) components from the Eppley Laboratory. Transmittance changes and other degradation observed after the return of the filters to Barr are reported. Substrates, coatings, and (where applicable) cement materials are identified. In general, all filters except those containing lead compounds survived well. Metal dielectric filters for the UV developed large numbers of pinholes which caused an increase in transmittance. Band shapes and spectral positioning, however, did not change.

Advanced Ultra-Violet (UV) Aircraft Fire Detection System. Volume 2. System Hardware Design, Software Design, and Test

DTIC Science & Technology

1982-08-01

REPORT SHT",, -ENGLAND A W*nson Match Company Saftey and Protion Division ISSUE " 3 (contd) HEADS 1 2 3 4 5 6 7 8 ,7 0 BITS iii ii The 832 tm inspection...input data buffering and output data buffering. 2.2.2.3.1. Power up, Reset Circuit To ensure correct system operation when power is first applied the...act in conjunction with R2, R3 and two buffer sections of IC2. When power is first applied , Cl is discharged, Via the pot chain divider of R2 and R3 the

Definition and Evolution of Transverse Momentum Distributions

NASA Astrophysics Data System (ADS)

Echevarría, Miguel G.; Idilbi, Ahmad; Scimemi, Ignazio

We consider the definition of unpolarized transverse-momentum-dependent parton distribution functions while staying on-the-light-cone. By imposing a requirement of identical treatment of two collinear sectors, our approach, compatible with a generic factorization theorem with the soft function included, is valid for all non-ultra-violet regulators (as it should), an issue which causes much confusion in the whole field. We explain how large logarithms can be resummed in a way which can be considered as an alternative to the use of Collins-Soper evolution equation. The evolution properties are also discussed and the gauge-invariance, in both classes of gauges, regular and singular, is emphasized.

Quality control of EUVE databases

NASA Technical Reports Server (NTRS)

John, L. M.; Drake, J.

1992-01-01

The publicly accessible databases for the Extreme Ultraviolet Explorer include: the EUVE Archive mailserver; the CEA ftp site; the EUVE Guest Observer Mailserver; and the Astronomical Data System node. The EUVE Performance Assurance team is responsible for verifying that these public EUVE databases are working properly, and that the public availability of EUVE data contained therein does not infringe any data rights which may have been assigned. In this poster, we describe the Quality Assurance (QA) procedures we have developed from the approach of QA as a service organization, thus reflecting the overall EUVE philosophy of Quality Assurance integrated into normal operating procedures, rather than imposed as an external, post facto, control mechanism.

A Search for EUV Emission from the O4f Star Zeta Puppis

NASA Technical Reports Server (NTRS)

Waldron, Wayne L.; Vallerga, John

1996-01-01

We obtained a 140 ks EUVE observation of the O4f star, zeta Puppis. Because of its low ISM column density and highly ionized stellar wind, a unique EUV window is accessible for viewing between 128 to 140 A, suggesting that this star may he the only O star observable with the EUVE. Although no SW spectrometer wavelength bin had a signal to noise greater than 3, a bin at 136 A had a signal to noise of 2.4. This bin is where models predict the brightest line due to OV emission should occur. We present several EUV line emission models. These models were constrained by fitting the ROSAT PSPC X-ray data and our EUVE data. If the OV emission is real, the best fits to the data suggest that there are discrepancies in our current understanding of EUV/X-ray production mechanisms. In particular, the emission measure of the EUV source is found to be much greater than the total wind emission measure, suggesting that the EUV shock must produce a very large density enhancement. In addition, the location of the EUV and X-ray shocks are found to be separated by approx. 0.3 stellar radii, but the EUV emission region is found to be approx. 400 times larger than the X-ray emission region. We also discuss the implications of a null detection and present relevant upper limits.

PECULIAR STATIONARY EUV WAVE FRONTS IN THE ERUPTION ON 2011 MAY 11

DOE Office of Scientific and Technical Information (OSTI.GOV)

Chandra, R.; Fulara, A.; Chen, P. F.

We present and interpret the observations of extreme ultraviolet (EUV) waves associated with a filament eruption on 2011 May 11. The filament eruption also produces a small B-class two ribbon flare and a coronal mass ejection. The event is observed by the Solar Dynamic Observatory with high spatio-temporal resolution data recorded by the Atmospheric Imaging Assembly. As the filament erupts, we observe two types of EUV waves (slow and fast) propagating outwards. The faster EUV wave has a propagation velocity of ∼500 km s{sup −1} and the slower EUV wave has an initial velocity of ∼120 km s{sup −1}. Wemore » report, for the first time, that not only does the slower EUV wave stop at a magnetic separatrix to form bright stationary fronts, but also the faster EUV wave transits a magnetic separatrix, leaving another stationary EUV front behind.« less

Characterization of Free-Standing Nano-Membranes by Using Ellipsometry

NASA Astrophysics Data System (ADS)

Park, Sungmo; Lee, Changho; An, Ilsin; Kim, Min-Su; Park, Jin-Goo; Ahn, Jin-ho

2018-04-01

The thickness of the pellicle is only a few tens of microns in extreme ultraviolet lithography (EUVL). This is because the absorption loss by the pellicle is high. Thus, the thickness and contamination on the surface of the EUVL pellicle are important factors for controlling the transmission of EUV light. In this work, we fabricate ultra-thin silicon-nitride membranes for EUVL pellicles and use micro-spot spectroscopic ellipsometry and imaging ellipsometry for characterization. We successfully deduce not only the thickness but also the optical function of the membrane. However, we found that some precautions were required for accurate measurement of the free-standing thin membranes by using ellipsometry. Issues related to the vibration of the membrane and the sensitivity of the measurement are discussed.

Extreme Ultraviolet Explorer. Long look at the next window

NASA Technical Reports Server (NTRS)

Maran, Stephen P.

1991-01-01

The Extreme Ultraviolet Explorer (EUVE) will map the entire sky to determine the existence, direction, brightness, and temperature of thousands of objects that are sources of so-called extreme ultraviolet (EUV) radiation. The EUV spectral region is located between the x-ray and ultraviolet regions of the electromagnetic spectrum. From the sky survey by EUVE, astronomers will determine the nature of sources of EUV light in our galaxy, and infer the distribution of interstellar gas for hundreds of light years around the solar system. It is from this gas and the accompanying dust in space that new stars and solar systems are born and to which evolving and dying stars return much of their material in an endless cosmic cycle of birth, death, and rebirth. Besides surveying the sky, astronomers will make detailed studies of selected objects with EUVE to determine their physical properties and chemical compositions. Also, they will learn about the conditions that prevail and the processes at work in stars, planets, and other sources of EUV radiation, maybe even quasars. The EUVE mission and instruments are described. The objects that EUVE will likely find are described.

Monolithic pattern-sensitive detector

DOEpatents

Berger, Kurt W.

2000-01-01

Extreme ultraviolet light (EUV) is detected using a precisely defined reference pattern formed over a shallow junction photodiode. The reference pattern is formed in an EUV absorber preferably comprising nickel or other material having EUV- and other spectral region attenuating characteristics. An EUV-transmissive energy filter is disposed between a passivation oxide layer of the photodiode and the EUV transmissive energy filter. The device is monolithically formed to provide robustness and compactness.

Selected highlights from the Extreme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Bowyer, S.; Malina, R. F.

1995-01-01

We present a few scientific highlights from the Extreme Ultraviolet Explorer (EUVE) all-sky and deep surveys, from the EUVE Righ Angle Program, and from the EUVE Guest Observer Program. The First EUVE Source Catalog includes 410 extreme ultraviolet (EUV) sources detected in the initial processing of the EUVE all-sky data. A program of optical identification indicates that counterparts include cool star coronae, flare stars, hot white dwarfs, central stars of planetary nebulae, B star photospheres and winds, an X-ray binary, extragalactic objects (active galactic nuclei, BL Lacertae), solar system objects (Moon, Mars, Io,), supernova remnants, and two novae.

Analytical techniques for mechanistic characterization of EUV photoresists

NASA Astrophysics Data System (ADS)

Grzeskowiak, Steven; Narasimhan, Amrit; Murphy, Michael; Ackerman, Christian; Kaminsky, Jake; Brainard, Robert L.; Denbeaux, Greg

2017-03-01

Extreme ultraviolet (EUV, 13.5 nm) lithography is the prospective technology for high volume manufacturing by the microelectronics industry. Significant strides towards achieving adequate EUV source power and availability have been made recently, but a limited rate of improvement in photoresist performance still delays the implementation of EUV. Many fundamental questions remain to be answered about the exposure mechanisms of even the relatively well understood chemically amplified EUV photoresists. Moreover, several groups around the world are developing revolutionary metal-based resists whose EUV exposure mechanisms are even less understood. Here, we describe several evaluation techniques to help elucidate mechanistic details of EUV exposure mechanisms of chemically amplified and metal-based resists. EUV absorption coefficients are determined experimentally by measuring the transmission through a resist coated on a silicon nitride membrane. Photochemistry can be evaluated by monitoring small outgassing reaction products to provide insight into photoacid generator or metal-based resist reactivity. Spectroscopic techniques such as thin-film Fourier transform infrared (FTIR) spectroscopy can measure the chemical state of a photoresist system pre- and post-EUV exposure. Additionally, electrolysis can be used to study the interaction between photoresist components and low energy electrons. Collectively, these techniques improve our current understanding of photomechanisms for several EUV photoresist systems, which is needed to develop new, better performing materials needed for high volume manufacturing.

Surface Inhomogeneities of the White Dwarf in the Binary EUVE J2013+400

NASA Astrophysics Data System (ADS)

Vennes, Stephane

We propose to study the white dwarf in the binary EUVE J2013+400. The object is paired with a dMe star and new extreme ultraviolet (EUV) observations will offer critical insights into the properties of the white dwarf. The binary behaves, in every other aspects, like its siblings EUVE J0720-317 and EUVE J1016-053 and new EUV observations will help establish their class properties; in particular, EUV photometric variations in 0720-317 and 1016-053 over a period of 11 hours and 57 minutes, respectively, are indicative of surface abundance inhomogeneities coupled with the white dwarfs rotation period. These variations and their large photospheric helium abundance are best explained by a diffusion-accretion model in which time-variable accretion and possible coupling to magnetic poles contribute to abundance variations across the surface and possibly as a function of depth. EUV spectroscopy will also enable a study of the helium abundance as a function of depth and a detailed comparison with theoretical diffusion profile.

Contrast matching of line gratings obtained with NXE3XXX and EUV- interference lithography

NASA Astrophysics Data System (ADS)

Tasdemir, Zuhal; Mochi, Iacopo; Olvera, Karen Garrido; Meeuwissen, Marieke; Yildirim, Oktay; Custers, Rolf; Hoefnagels, Rik; Rispens, Gijsbert; Fallica, Roberto; Vockenhuber, Michaela; Ekinci, Yasin

2017-10-01

Extreme UV lithography (EUVL) has gained considerable attention for several decades as a potential technology for the semiconductor industry and it is now close to being adopted in high-volume manufacturing. At Paul Scherrer Institute (PSI), we have focused our attention on EUV resist performance issues by testing available high-performance EUV resists in the framework of a joint collaboration with ASML. For this purpose, we use the grating-based EUV-IL setup installed at the Swiss Light Source (SLS) at PSI, in which a coherent beam with 13.5 nm wavelength is used to produce a periodic aerial image with virtually 100% contrast and large depth of focus. Interference lithography is a relatively simple technique and it does not require many optical components, therefore the unintended flare is minimized and the aerial image is well-defined sinusoidal pattern. For the collaborative work between PSI and ASML, exposures are being performed on the EUV-IL exposure tool at PSI. For better quantitative comparison to the NXE scanner results, it is targeted to determine the actual NILS of the EUV-IL exposure tool at PSI. Ultimately, any resist-related metrology must be aligned and compared with the performance of EUV scanners. Moreover, EUV-IL is a powerful method for evaluating the resist performance and a resist which performs well with EUV-IL, shows, in general, also good performance with NXE scanners. However, a quantitative prediction of the performance based on EUV-IL measurements has not been possible due to the differences in aerial image formation. In this work, we aim to study the performance of EUV resists with different aerial images. For this purpose, after the real interference pattern exposure, we overlay a flat field exposure to emulate different levels of contrast. Finally, the results are compared with data obtained from EUV scanner. This study will enable not only match the data obtained from EUV- IL at PSI with the performance of NXE scanners, but also a better understanding of resist fundamentals by studying the effects of the aerial image on resist performance by changing the aerial image contrast in a controlled manner using EUV-IL.

A new mask exposure and analysis facility

NASA Astrophysics Data System (ADS)

te Sligte, Edwin; Koster, Norbert; Deutz, Alex; Staring, Wilbert

2014-10-01

The introduction of ever higher source powers in EUV systems causes increased risks for contamination and degradation of EUV masks and pellicles. Appropriate testing can help to inventory and mitigate these risks. To this end, we propose EBL2: a laboratory EUV exposure system capable of operating at high EUV powers and intensities, and capable of exposing and analyzing EUV masks. The proposed system architecture is similar to the EBL system which has been operated jointly by TNO and Carl Zeiss SMT since 2005. EBL2 contains an EUV Beam Line, in which samples can be exposed to EUV irradiation in a controlled environment. Attached to this Beam Line is an XPS system, which can be reached from the Beam Line via an in-vacuum transfer system. This enables surface analysis of exposed masks without breaking vacuum. Automated handling with dual pods is foreseen so that exposed EUV masks will still be usable in EUV lithography tools to assess the imaging impact of the exposure. Compared to the existing system, large improvements in EUV power, intensity, reliability, and flexibility are proposed. Also, in-situ measurements by e.g. ellipsometry is foreseen for real time monitoring of the sample condition. The system shall be equipped with additional ports for EUVR or other analysis tools. This unique facility will be open for external customers and other research groups.

Mechanism of soft x-ray continuum radiation from low-energy pinch discharges of hydrogen and ultra-low field ignition of solid fuels

NASA Astrophysics Data System (ADS)

Mills, R.; Lotoski, J.; Lu, Y.

2017-09-01

EUV continuum radiation (10-30 nm) arising only from very low energy pulsed pinch gas discharges comprising some hydrogen was first observed at BlackLight Power, Inc. and reproduced at the Harvard Center for Astrophysics (CfA). The source was determined to be due to the transition of H to the lower-energy hydrogen or hydrino state H(1/4) whose emission matches that observed wherein alternative sources were eliminated. The identity of the catalyst that accepts 3 · 27.2 eV from the H to cause the H to H(1/4) transition was determined to HOH versus 3H. The mechanism was elucidated using different oxide-coated electrodes that were selective in forming HOH versus plasma forming metal atoms as well as from the intensity profile that was a mismatch for the multi-body reaction required during 3H catalysis. The HOH catalyst was further shown to give EUV radiation of the same nature by igniting a solid fuel comprising a source of H and HOH catalyst by passing a low voltage, high current through the fuel to produce explosive plasma. No chemical reaction can release such high-energy light. No high field existed to form highly ionized ions that could give radiation in this EUV region that persisted even without power input. This plasma source serves as strong evidence for the existence of the transition of H to hydrino H(1/4) by HOH as the catalyst and a corresponding new power source wherein initial extraordinarily brilliant light-emitting prototypes are already producing photovoltaic generated electrical power. The hydrino product of a catalyst reaction of atomic hydrogen was analyzed by multiple spectroscopic techniques. Moreover, the mH catalyst was identified to be active in astronomical sources such as the Sun, stars and interstellar medium wherein the characteristics of hydrino match those of the dark matter of the Universe.

Novel EUV photoresist for sub-7nm node (Conference Presentation)

NASA Astrophysics Data System (ADS)

Furukawa, Tsuyoshi; Naruoka, Takehiko; Nakagawa, Hisashi; Miyata, Hiromu; Shiratani, Motohiro; Hori, Masafumi; Dei, Satoshi; Ayothi, Ramakrishnan; Hishiro, Yoshi; Nagai, Tomoki

2017-04-01

Extreme ultraviolet (EUV) lithography has been recognized as a promising candidate for the manufacturing of semiconductor devices as LS and CH pattern for 7nm node and beyond. EUV lithography is ready for high volume manufacturing stage. For the high volume manufacturing of semiconductor devices, significant improvement of sensitivity and line edge roughness (LWR) and Local CD Uniformity (LCDU) is required for EUV resist. It is well-known that the key challenge for EUV resist is the simultaneous requirement of ultrahigh resolution (R), low line edge roughness (L) and high sensitivity (S). Especially high sensitivity and good roughness is important for EUV lithography high volume manufacturing. We are trying to improve sensitivity and LWR/LCDU from many directions. From material side, we found that both sensitivity and LWR/LCDU are simultaneously improved by controlling acid diffusion length and efficiency of acid generation using novel resin and PAG. And optimizing EUV integration is one of the good solution to improve sensitivity and LWR/LCDU. We are challenging to develop new multi-layer materials to improve sensitivity and LWR/LCDU. Our new multi-layer materials are designed for best performance in EUV lithography system. From process side, we found that sensitivity was substantially improved maintaining LWR applying novel type of chemical amplified resist (CAR) and process. EUV lithography evaluation results obtained for new CAR EUV interference lithography. And also metal containing resist is one possibility to break through sensitivity and LWR trade off. In this paper, we will report the recent progress of sensitivity and LWR/LCDU improvement of JSR novel EUV resist and process.

EUVE and IR observations of the Polars HU Aqr and AR UMa

NASA Astrophysics Data System (ADS)

Howell, S.; Ciardi, D.

1999-12-01

Simultaneous EUVE and ground-based near-infrared J and K observations of the magnetic CV HU Aqr were performed. The observations occurred during a super-high state never before observed in HU Aqr. The average EUVE count-rate was 30-60 times higher than had been measured previously, allowing us to present the first ever EUV spectra of HU Aqr. The near-infrared observations show a corresponding flux increase of 2-3 times over previous J and K observations. However, the near-infrared eclipse minimum during this super-high state are the same as seen in previous observations, indicating that the eclipse in the near-infrared is total. We present a detailed comparison of the EUV and near-infrared emission of HU Aqr as a function of orbital phase and discuss the geometry and physical properties of the high energy and infrared emitting regions. AR UMa is the brightest EUV source yet observed with the EUVE satellite and is also the polar with the largest magnetic field, 250 MG. EUVE observations of the polar AR UMa have allowed, for the first time, EUV time-resolved spectral analysis and radial velocity measurements. We present EUV phase-resolved photometry and spectroscopy and show that the He 304 emission line is not produced on the heated face of the secondary star, but emanates from the inner illuminated regions of the coupling region and accretion stream. We comment on the overall structure of the accretion geometry as well. The authors acknowledge partial support of the research by NASA cooperative agreement NCC5-138 via an EUVE guest Observer mini-grant.

Gamma-insensitive optical sensor

DOEpatents

Kruger, Hans W.

1994-01-01

An ultra-violet/visible/infra-red gamma-insensitive gas avalanche focal plane array comprising a planar photocathode and a planar anode pad array separated by a gas-filled gap and across which is applied an electric potential. Electrons ejected from the photocathode are accelerated sufficiently between collisions with the gas molecules to ionize them, forming an electron avalanche. The gap acts like a proportional counter. The array of anode pad are mounted on the front of an anode plate and are connected to matching contact pads on the back of the anode via feed through wires. Connection of the anode to signal processing electronics is made from the contact pads using standard indium bump techniques, for example.

Co-existence of a few and sub micron inhomogeneities in Al-rich AlGaN/AlN quantum wells

DOE Office of Scientific and Technical Information (OSTI.GOV)

Iwata, Yoshiya; Oto, Takao; Banal, Ryan G.

2015-03-21

Inhomogeneity in Al-rich AlGaN/AlN quantum wells is directly observed using our custom-built confocal microscopy photoluminescence (μ-PL) apparatus with a reflective system. The μ-PL system can reach the AlN bandgap in the deep ultra-violet spectral range with a spatial resolution of 1.8 μm. In addition, cathodoluminescence (CL) measurements with a higher spatial resolution of about 100 nm are performed. A comparison of the μ-PL and CL measurements reveals that inhomogeneities, which have different spatial distributions of a few- and sub-micron scales that are superimposed, play key roles in determining the optical properties.

Electronic structure and optical properties of metal doped tetraphenylporphyrins

NASA Astrophysics Data System (ADS)

Shah, Esha V.; Roy, Debesh R.

2018-05-01

A density functional scrutiny on the structure, electronic and optical properties of metal doped tetraphenylporphyrins MTPP (M=Fe, Co, Ni) is performed. The structural stability of the molecules is evaluated based on the electronic parameters like HOMO-LUMO gap (HLG), chemical hardness (η) and binding energy of the central metal atom to the molecular frame etc. The computed UltraViolet-Visible (UV-Vis) optical absorption spectra for all the compounds are also compared. The molecular structures reported are the lowest energy configurations. The entire calculations are carried out with a widely reliable functional, viz. B3LYP with a popular basis set which includes a scaler relativistic effect, viz. LANL2DZ.

Communication: "Position" does matter: The photofragmentation of the nitroimidazole isomers

NASA Astrophysics Data System (ADS)

Bolognesi, P.; Casavola, A. R.; Cartoni, A.; Richter, R.; Markus, P.; Borocci, S.; Chiarinelli, J.; Tošić, S.; Sa'adeh, H.; Masič, M.; Marinković, B. P.; Prince, K. C.; Avaldi, L.

2016-11-01

A combined experimental and theoretical approach has been used to disentangle the fundamental mechanisms of the fragmentation of the three isomers of nitroimidazole induced by vacuum ultra-violet (VUV) radiation, namely, 4-, 5-, and 2-nitroimidazole. The results of mass spectrometry as well as photoelectron-photoion coincidence spectroscopy display striking differences in the radiation-induced decomposition of the different nitroimidazole radical cations. Based on density functional theory (DFT) calculations, a model is proposed which fully explains such differences, and reveals the subtle fragmentation mechanisms leading to the release of neutral species like NO, CO, and HCN. Such species have a profound impact in biological media and may play a fundamental role in radiosensitising mechanisms during radiotherapy.

EXPERIMENT - APOLLO XVI (UV)

NASA Image and Video Library

1972-06-06

S72-40818 (21 April 1972) --- A color enhancement of an ultra-violet photograph of the geocorona, a halo of low density hydrogen around Earth. Sunlight is shining from the left, and the geocorona is brighter on that side. The UV camera was operated by astronaut John W. Young on the Apollo 16 lunar landing mission. It was designed and built at the Naval Research Laboratory, Washington, D.C. While astronauts Young, commander, and Charles M. Duke Jr., lunar module pilot, descended in the Lunar Module (LM) "Orion" to explore the Descartes highlands region of the moon, astronaut Thomas K. Mattingly II, command module pilot, remained with the Command and Service Modules (CSM) "Casper" in lunar orbit.

Monitoring of ultraviolet pulse rate dependent photomechanical actuation in carbon nanotubes using fiber Bragg gratings

DOE Office of Scientific and Technical Information (OSTI.GOV)

Shivananju, B. N.; Suri, Ashish; Asokan, S.

2014-01-06

In this Letter, we present a non-contact method of controlling and monitoring photomechanical actuation in carbon nanotubes (CNT) by exposing it to ultra-violet radiation at different pulse rates (10 to 200 Hz). This is accomplished by imparting a reversible photo induced strain (5–330 με) on CNT coated fibre Bragg gratings; CNT undergoes an internal reversible structural change due to cyclic photon absorption that leads to the development of mechanical strain, which in turn allows reversible switching of the Bragg wavelength. The results also reveal an interesting pulse rate dependent rise and fall times of photomechanical actuation in CNT.

Growth of GaN single crystals by a Ca- and Ba-added Na flux method

NASA Astrophysics Data System (ADS)

Ukegawa, H.; Konishi, Y.; Fujimori, T.; Miyoshi, N.; Imade, M.; Yoshimura, M.; Kitaoka, Y.; Sasaki, T.; Mori, Y.

2011-02-01

GaN substrates are desirable for fabricating ultra-violet LEDs and LDs, and high-power and high-frequency transistors. High-quality GaN single crystals can be obtained by using Na flux method, but the growth habit of bulk crystals must be controlled. In this study, we investigated the effects of additives (Ca, Ba) on the growth habit and impurity concentration in the crystals. The aspect ratio (c/a) of the crystals was increased by increasing the amount of additives, showing that the growth habit could be changed from the pyramidal shape to the prism shape. Ba concentration was below the detection limit (1x1015 atoms/cm3).

Nanostructured magnesium oxide biosensing platform for cholera detection

NASA Astrophysics Data System (ADS)

Patel, Manoj K.; Azahar Ali, Md.; Agrawal, Ved V.; Ansari, Z. A.; Ansari, S. G.; Malhotra, B. D.

2013-04-01

We report fabrication of highly crystalline nanostructured magnesium oxide (NanoMgO, size >30 nm) film electrophoretically deposited onto indium-tin-oxide (ITO) glass substrate for Vibrio cholerae detection. The single stranded deoxyribonucleic acid (ssDNA) probe, consisting of 23 bases (O1 gene sequence) immobilized onto NanoMgO/ITO electrode surface, has been characterized using electrochemical, Fourier Transform-Infra Red, and UltraViolet-visible spectroscopic techniques. The hybridization studies of ssDNA/NanoMgO/ITO bioelectrode with fragmented target DNA conducted using differential pulse voltammetry reveal sensitivity as 16.80 nA/ng/cm2, response time of 3 s, linearity as 100-500 ng/μL, and stability of about 120 days.

VUV dissociative excitation cross sections of H2O, NH3, and CH4 by electron impact. [Vacuum Ultra-Violet

NASA Technical Reports Server (NTRS)

Morgan, H. D.; Mentall, J. E.

1974-01-01

Absolute excitation functions for excited fragments resulting from electron bombardment of H2O, NH3, and CH4 by low-energy electrons (0 to 300 eV) have been measured in the vacuum ultraviolet (1100 to 1950 A). The predominant emission for each molecule was the H Lyman-alpha line, while the O I, N I, C I, and C II emissions were at least an order of magnitude weaker. Absolute cross sections at 100 eV are given along with the appearance potential of the various processes and the possible dissociative-excitation channels through which such processes proceed.

Acidity-controlled selective oxidation of alpha-pinene, isolated from Indonesian pine's turpentine oils (pinus merkusii)

NASA Astrophysics Data System (ADS)

Masruri; Farid Rahman, Mohamad; Nurkam Ramadhan, Bagus

2016-02-01

Alpha-pinene was isolated in high purity from turpentine oil harvested from Pinus merkusii plantation. The recent investigation on selective oxidation of alpha-pinene using potassium permanganate was undertaken under acidic conditions. The result taught the selective oxidation of alpha-pinene in acidic using potassium permanganate lead to the formation of 2-(3-acetyl-2,2-dimethylcyclobutyl)acetaldehyde or pinon aldehyde. The study method applied reaction in various different buffer conditions i.e. pH 3, 4, 5, and 6, respectively, and each reaction product was monitored using TLC every hour. Product determination was undertaken on spectrometry basis such as infrared, ultra violet-visible, gas chromatography- and liquid chromatography-mass spectrometry.

Observation of extremely strong shock waves in solids launched by petawatt laser heating

DOE PAGES

Lancaster, K. L.; Robinson, A. P. L.; Pasley, J.; ...

2017-08-25

Understanding hydrodynamic phenomena driven by fast electron heating is important for a range of applications including fast electron collimation schemes for fast ignition and the production and study of hot, dense matter. In this work, detailed numerical simulations modelling the heating, hydrodynamic evolution, and extreme ultra-violet (XUV) emission in combination with experimental XUV images indicate shock waves of exceptional strength (200 Mbar) launched due to rapid heating of materials via a petawatt laser. In conclusion, we discuss in detail the production of synthetic XUV images and how they assist us in interpreting experimental XUV images captured at 256 eV usingmore » a multi-layer spherical mirror.« less

Biosynthesis of silver and platinum nanoparticles using orange peel extract: characterisation and applications.

PubMed

Castro, Laura; Blázquez, María Luisa; González, Felisa; Muñoz, Jesús Ángel; Ballester, Antonio

2015-10-01

This study focuses on the green synthesis of noble metal nanoparticles (silver (Ag) and platinum (Pt)) and how the size and shape of the nanoparticles produced can be controlled through changes in the initial pH value of the precursor solution. The nanoparticles were characterised by ultra-violet-visible spectroscopy, transmission electron microscopy and X-ray diffraction. This simple and environmentally friendly method allows the synthesis of diverse nanostructures in the absence of a surfactant or polymer to direct nanoparticle growth, and without externally adding seed crystallites. The antibacterial effects of Ag nanoparticles and catalytic properties of Pt nanoparticles were explored for future promising biotechnological approaches in different fields.

Indirect intergenic suppression of a radiosensitive mutant of Sordaria macrospora defective in sister-chromatid cohesiveness.

PubMed

Huynh, A D; Leblon, G; Zickler, D

1986-01-01

Six ultra violet (UV) mutageneses were performed on the spo76 UV-sensitive mutant of Sordaria macrospora. Spo76 shows an early centromere cleavage associated with an arrest at the first meiotic division and therefore does not form ascospores. Moreover, it exhibits altered pairing structure (synaptonemal complex), revealing a defect in the sister-chromatid cohesiveness. From 37 revertants which partially restored sporulation, 34 extragenic suppressors of spo76 were isolated. All suppressors are altered in chromosomal pairing but, unlike spo76, show a wild type centromere cleavage. The 34 suppressors were assigned to six different genes and mapped. Only one of the suppressor genes is involved in repair functions.

SIGN SINGULARITY AND FLARES IN SOLAR ACTIVE REGION NOAA 11158

DOE Office of Scientific and Technical Information (OSTI.GOV)

Sorriso-Valvo, L.; De Vita, G.; Kazachenko, M. D.

Solar Active Region NOAA 11158 has hosted a number of strong flares, including one X2.2 event. The complexity of current density and current helicity are studied through cancellation analysis of their sign-singular measure, which features power-law scaling. Spectral analysis is also performed, revealing the presence of two separate scaling ranges with different spectral index. The time evolution of parameters is discussed. Sudden changes of the cancellation exponents at the time of large flares and the presence of correlation with Extreme-Ultra-Violet and X-ray flux suggest that eruption of large flares can be linked to the small-scale properties of the current structures.

Separation of toxic metal ions, hydrophilic hydrocarbons, hydrophobic fuel and halogenated hydrocarbons and recovery of ethanol from a process stream

DOEpatents

Kansa, Edward J.; Anderson, Brian L.; Wijesinghe, Ananda M.; Viani, Brian E.

1999-01-01

This invention provides a process to tremendously reduce the bulk volume of contaminants obtained from an effluent stream produced subsurface remediation. The chemicals used for the subsurface remediation are reclaimed for recycling to the remediation process. Additional reductions in contaminant bulk volume are achieved by the ultra-violet light destruction of halogenated hydrocarbons, and the complete oxidation of hydrophobic fuel hydrocarbons and hydrophilic hydrocarbons. The contaminated bulk volume will arise primarily from the disposal of the toxic metal ions. The entire process is modular, so if there are any technological breakthroughs in one or more of the component process modules, such modules can be readily replaced.

Molecular beam epitaxy-grown wurtzite MgS thin films for solar-blind ultra-violet detection

DOE Office of Scientific and Technical Information (OSTI.GOV)

Lai, Y. H.; He, Q. L.; Department of Physics and William Mong Institute of Nano Science and Technology, The Hong Kong University of Science and Technology, HKSAR, People's Republic of China

2013-04-29

Molecular beam epitaxy grown MgS on GaAs(111)B substrate was resulted in wurtzite phase, as demonstrated by detailed structural characterizations. Phenomenological arguments were used to account for why wurtzite phase is preferred over zincblende phase or its most stable rocksalt phase. Results of photoresponse and reflectance measurements performed on wurtzite MgS photodiodes suggest a direct bandgap at around 5.1 eV. Their response peaks at 245 nm with quantum efficiency of 9.9% and enjoys rejection of more than three orders at 320 nm and close to five orders at longer wavelengths, proving the photodiodes highly competitive in solar-blind ultraviolet detection.

Universal EUV in-band intensity detector

DOEpatents

Berger, Kurt W.

2004-08-24

Extreme ultraviolet light is detected using a universal in-band detector for detecting extreme ultraviolet radiation that includes: (a) an EUV sensitive photodiode having a diode active area that generates a current responsive to EUV radiation; (b) one or more mirrors that reflects EUV radiation having a defined wavelength(s) to the diode active area; and (c) a mask defining a pinhole that is positioned above the diode active area, wherein EUV radiation passing through the pinhole is restricted substantially to illuminating the diode active area.

The extreme ultraviolet explorer mission

NASA Technical Reports Server (NTRS)

Malina, R. F.; Bowyer, S.

1988-01-01

The science design goals and engineering implementation for the Extreme Ultraviolet Explorer (EUVE) science payload are discussed. The primary scientific goal of the EUVE payload is to carry out an all-sky survey in the 100- to 900-A band of the spectrum. Another goal of the mission is to demonstrate the use of a scientific platform in near-earth orbit. EUVE data will be used to study the distribution of EUV stars in the neighborhood of the sun and the emission physics responsible for the EUV mission.

Characterization of extreme ultraviolet laser ablation mass spectrometry for actinide trace analysis and nanoscale isotopic imaging

DOE Office of Scientific and Technical Information (OSTI.GOV)

Green, Tyler; Kuznetsov, Ilya; Willingham, David

The purpose of this research was to characterize Extreme Ultraviolet Time-of-Flight (EUV TOF) Laser Ablation Mass Spectrometry for high spatial resolution elemental and isotopic analysis. We compare EUV TOF results with Secondary Ionization Mass Spectrometry (SIMS) to orient the EUV TOF method within the overall field of analytical mass spectrometry. Using the well-characterized NIST 61x glasses, we show that the EUV ionization approach produces relatively few molecular ion interferences in comparison to TOF SIMS. We demonstrate that the ratio of element ion to element oxide ion is adjustable with EUV laser pulse energy and that the EUV TOF instrument hasmore » a sample utilization efficiency of 0.014%. The EUV TOF system also achieves a lateral resolution of 80 nm and we demonstrate this lateral resolution with isotopic imaging of closely spaced particles or uranium isotopic standard materials.« less

Particle protection capability of SEMI-compliant EUV-pod carriers

NASA Astrophysics Data System (ADS)

Huang, George; He, Long; Lystad, John; Kielbaso, Tom; Montgomery, Cecilia; Goodwin, Frank

2010-04-01

With the projected rollout of pre-production extreme ultraviolet lithography (EUVL) scanners in 2010, EUVL pilot line production will become a reality in wafer fabrication companies. Among EUVL infrastructure items that must be ready, EUV mask carriers remain critical. To keep non-pellicle EUV masks free from particle contamination, an EUV pod concept has been extensively studied. Early prototypes demonstrated nearly particle-free results at a 53 nm PSL equivalent inspection sensitivity during EUVL mask robotic handling, shipment, vacuum pump-purge, and storage. After the passage of SEMI E152, which specifies the EUV pod mechanical interfaces, standards-compliant EUV pod prototypes, including a production version inner pod and prototype outer pod, were built and tested. Their particle protection capability results are reported in this paper. A state-of-the-art blank defect inspection tool was used to quantify their defect protection capability during mask robotic handling, shipment, and storage tests. To ensure the availability of an EUV pod for 2010 pilot production, the progress and preliminary test results of pre-production EUV outer pods are reported as well.

Objective for EUV microscopy, EUV lithography, and x-ray imaging

DOEpatents

Bitter, Manfred; Hill, Kenneth W.; Efthimion, Philip

2016-05-03

Disclosed is an imaging apparatus for EUV spectroscopy, EUV microscopy, EUV lithography, and x-ray imaging. This new imaging apparatus could, in particular, make significant contributions to EUV lithography at wavelengths in the range from 10 to 15 nm, which is presently being developed for the manufacturing of the next-generation integrated circuits. The disclosure provides a novel adjustable imaging apparatus that allows for the production of stigmatic images in x-ray imaging, EUV imaging, and EUVL. The imaging apparatus of the present invention incorporates additional properties compared to previously described objectives. The use of a pair of spherical reflectors containing a concave and convex arrangement has been applied to a EUV imaging system to allow for the image and optics to all be placed on the same side of a vacuum chamber. Additionally, the two spherical reflector segments previously described have been replaced by two full spheres or, more precisely, two spherical annuli, so that the total photon throughput is largely increased. Finally, the range of permissible Bragg angles and possible magnifications of the objective has been largely increased.

Initial results from the extreme ultraviolet explorer

NASA Technical Reports Server (NTRS)

Bowyer, S.; Malina, R. F.

1993-01-01

Data obtained during the first five months of calibration and science operation of the Extreme Ultraviolet Explorer (EUVE) are presented. Spectra of an extragalactic object were obtained; the object is detectable to wavelenghts longer than 100 A, demonstrating that extragalactic EUV astronomy is possible. Spectra of a hot white dwarf, and a late-type star in quiescence and flaring are shown as examples of the type of spectrographic data obtainable with EUVE. Other objects for which broad band photometric mode data have been obtained and analyzed include an RS CVn star and several late-type stars. The backgrounds in the EUVE detectors are quite low and the character of the diffuse astronomical EUV background has been investigated using these very low rates. Evidence is presented showing that, contrary to previously published reports, EUVE is about three times more sensitive than the English Wide Field Camera in the short wavelength bandpass covered by both instruments. Only limited information has been extracted from the longer bandpasses coered only by EUVE. Nonetheless, the brightest EUV source in the sky, a B star, has been discovered and is detected only in these longer bandpasses.

Surface roughness control by extreme ultraviolet (EUV) radiation

NASA Astrophysics Data System (ADS)

Ahad, Inam Ul; Obeidi, Muhannad Ahmed; Budner, Bogusław; Bartnik, Andrzej; Fiedorowicz, Henryk; Brabazon, Dermot

2017-10-01

Surface roughness control of polymeric materials is often desirable in various biomedical engineering applications related to biocompatibility control, separation science and surface wettability control. In this study, Polyethylene terephthalate (PET) polymer films were irradiated with Extreme ultraviolet (EUV) photons in nitrogen environment and investigations were performed on surface roughness modification via EUV exposure. The samples were irradiated at 3 mm and 4 mm distance from the focal spot to investigate the effect of EUV fluence on topography. The topography of the EUV treated PET samples were studied by AFM. The detailed scanning was also performed on the sample irradiated at 3 mm. It was observed that the average surface roughness of PET samples was increased from 9 nm (pristine sample) to 280 nm and 253 nm for EUV irradiated samples. Detailed AFM studies confirmed the presence of 1.8 mm wide period U-shaped channels in EUV exposed PET samples. The walls of the channels were having FWHM of about 0.4 mm. The channels were created due to translatory movements of the sample in horizontal and transverse directions during the EUV exposure. The increased surface roughness is useful for many applications. The nanoscale channels fabricated by EUV exposure could be interesting for microfluidic applications based on lab-on-a-chip (LOC) devices.

EUV mask pilot line at Intel Corporation

NASA Astrophysics Data System (ADS)

Stivers, Alan R.; Yan, Pei-Yang; Zhang, Guojing; Liang, Ted; Shu, Emily Y.; Tejnil, Edita; Lieberman, Barry; Nagpal, Rajesh; Hsia, Kangmin; Penn, Michael; Lo, Fu-Chang

2004-12-01

The introduction of extreme ultraviolet (EUV) lithography into high volume manufacturing requires the development of a new mask technology. In support of this, Intel Corporation has established a pilot line devoted to encountering and eliminating barriers to manufacturability of EUV masks. It concentrates on EUV-specific process modules and makes use of the captive standard photomask fabrication capability of Intel Corporation. The goal of the pilot line is to accelerate EUV mask development to intersect the 32nm technology node. This requires EUV mask technology to be comparable to standard photomask technology by the beginning of the silicon wafer process development phase for that technology node. The pilot line embodies Intel's strategy to lead EUV mask development in the areas of the mask patterning process, mask fabrication tools, the starting material (blanks) and the understanding of process interdependencies. The patterning process includes all steps from blank defect inspection through final pattern inspection and repair. We have specified and ordered the EUV-specific tools and most will be installed in 2004. We have worked with International Sematech and others to provide for the next generation of EUV-specific mask tools. Our process of record is run repeatedly to ensure its robustness. This primes the supply chain and collects information needed for blank improvement.

EUVE GO Survey: High Levels of User Satisfaction

NASA Astrophysics Data System (ADS)

Stroozas, B. A.

2000-12-01

This paper describes the results of a detailed customer survey of Guest Observers (GOs) for NASA's Extreme Ultraviolet Explorer (EUVE) astronomy satellite observatory. The purpose of the research survey was to (1) measure the levels of GO customer satisfaction with respect to EUVE observing services, and (2) compare the observing experiences of EUVE GOs with their experiences using other satellite observatories. This survey was conducted as a business research project -- part of the author's graduate work as an MBA candidate. A total sample of 38 respondents, from a working population of 101 "active" EUVE GOs, participated in this survey. The results, which provided a profile of the "typical" EUVE GO, showed in a statistically significant fashion that these GOs were more than satisfied with the available EUVE observing services. In fact, the sample GOs generally rated their EUVE observing experiences to be better than average as compared to their experiences as GOs on other missions. These relatively high satisfaction results are particularly pleasing to the EUVE Project which, given its significantly reduced staffing environment at U.C. Berkeley, has continued to do more with less. This paper outlines the overall survey process: the relevant background and previous research, the survey design and methodology, and the final results and their interpretation. The paper also points out some general limitations and weaknesses of the study, along with some recommended actions for the EUVE Project and for NASA in general. This work was funded by NASA/UCB Cooperative Agreement NCC5-138.

Temporal variations of solar EUV, UV, and 10,830-A radiations

NASA Technical Reports Server (NTRS)

Donnelly, R. F.; Hinteregger, H. E.; Heath, D. F.

1986-01-01

The temporal characteristics of the full-disk chromospheric EUV fluxes agree well with those of the ground-based measurements of the chromospheric He I absorption line at 10,830 A and differ systematically from those of the coronal EUV and 10.7-cm flux. The ratio of the flux increase during the rise of solar cycle 21 to that during solar rotation variations is uniformly high for the chromospheric EUV and corroborating 10,830-A fluxes, highest for the transition region and 'cool' coronal EUV fluxes (T less than 2 x 10 to the 6th K), and lowest for the 'hot' coronal EUV and 10.7-cm flux. The rise and decay rates of episodes of major activity progress from those for the hot coronal EUV lines and the 10.7-cm flux to slower values for the chromospheric H Lyman alpha line, 10,830-A line, and photospheric 2050-A UV flux. It is suggested that active region remnants contribute significantly to the solar cycle increase and during the decay of episodes of major activity. The ratio of power in 13-day periodicity to that for 27 days in high (1/3) for the photospheric UV flux, medium (1/6) for the chromospheric EUV and 10,830-A fluxes, and small to negligible for the hot coronal EUV fluxes. These ratios are used to estimate the dependence of active region emission on the solar central meridian distance for chromospheric and coronal EUV flux.

Fundamentals of EUV resist-inorganic hardmask interactions

NASA Astrophysics Data System (ADS)

Goldfarb, Dario L.; Glodde, Martin; De Silva, Anuja; Sheshadri, Indira; Felix, Nelson M.; Lionti, Krystelle; Magbitang, Teddie

2017-03-01

High resolution Extreme Ultraviolet (EUV) patterning is currently limited by EUV resist thickness and pattern collapse, thus impacting the faithful image transfer into the underlying stack. Such limitation requires the investigation of improved hardmasks (HMs) as etch transfer layers for EUV patterning. Ultrathin (<5nm) inorganic HMs can provide higher etch selectivity, lower post-etch LWR, decreased defectivity and wet strippability compared to spin-on hybrid HMs (e.g., SiARC), however such novel layers can induce resist adhesion failure and resist residue. Therefore, a fundamental understanding of EUV resist-inorganic HM interactions is needed in order to optimize the EUV resist interfacial behavior. In this paper, novel materials and processing techniques are introduced to characterize and improve the EUV resist-inorganic HM interface. HM surface interactions with specific EUV resist components are evaluated for open-source experimental resist formulations dissected into its individual additives using EUV contrast curves as an effective characterization method to determine post-development residue formation. Separately, an alternative adhesion promoter platform specifically tailored for a selected ultrathin inorganic HM based on amorphous silicon (aSi) is presented and the mitigation of resist delamination is exemplified for the cases of positive-tone and negative-tone development (PTD, NTD). Additionally, original wafer priming hardware for the deposition of such novel adhesion promoters is unveiled. The lessons learned in this work can be directly applied to the engineering of EUV resist materials and processes specifically designed to work on such novel HMs.

Extreme ultraviolet (EUV) solar spectral irradiance (SSI) for ionospheric application - history and contemporary state-of-art

NASA Astrophysics Data System (ADS)

Schmidtke, G.; Jacobi, Ch.; Nikutowski, B.; Erhardt, Ch.

2014-11-01

After a historical survey of space related EUV measurements in Germany and the role of Karl Rawer in pursuing this work, we describe present developments in EUV spectroscopy and provide a brief outlook on future activities. The group of Karl Rawer has performed the first scientific space project in Western Europe on 19th October 1954. Then it was decided to include the field of solar EUV spectroscopy in ionospheric investigations. Starting in 1957 an intensified development of instrumentation was going on to explore solar EUV radiation, atmospheric airglow and auroral emissions until the institute had to stop space activities in the early nineteen-eighties. EUV spectroscopy was continued outside of the institute during eight years. This area of work was supported again by the institute developing the Auto-Calibrating Spectrometers (SolACES) for a mission on the International Space Station (ISS). After more than six years in space the instrument is still in operation. Meanwhile the work on the primary task also to validate EUV data available from other space missions has made good progress. The first results of validating those data and combine them into one set of EUV solar spectral irradiance are very promising. It will be recommended for using it by the science and application community. Moreover, a new low-cost type of an EUV spectrometer is presented for monitoring the solar EUV radiation. It shall be further developed for providing EUV-TEC data to be applied in ionospheric models replacing the Covington index F10.7. Applying these data for example in the GNSS signal evaluation a more accurate determination of GNSS receiver positions is expected for correcting the propagation delays of navigation signals traveling through the ionosphere from space to earth. - Latest results in the field of solar EUV spectroscopy are discussed, too.

Development of a EUV Test Facility at the Marshall Space Flight Center

NASA Technical Reports Server (NTRS)

West, Edward; Pavelitz, Steve; Kobayashi, Ken; Robinson, Brian; Cirtain, Johnathan; Gaskin, Jessica; Winebarger, Amy

2011-01-01

This paper will describe a new EUV test facility that is being developed at the Marshall Space Flight Center (MSFC) to test EUV telescopes. Two flight programs, HiC - high resolution coronal imager (sounding rocket) and SUVI - Solar Ultraviolet Imager (GOES-R), set the requirements for this new facility. This paper will discuss those requirements, the EUV source characteristics, the wavelength resolution that is expected and the vacuum chambers (Stray Light Facility, Xray Calibration Facility and the EUV test chamber) where this facility will be used.

Design and progress in the fabrication of an EUV micro exposure tool optics for PREUVE

NASA Astrophysics Data System (ADS)

Geyl, Roland; Tanne, Jean-Francois

2001-12-01

SAGEM, through its REOSC product line, is participating since November 1999 to PREUVE, the French EUV initiative, and work within this program especially in the field of EUV illumination and projection optics. After a short description of the PREUVE main lines of activity, we will detail our contributions to this program and work progress. This is mainly focused on basic EUV optics fabrication technology in order to ensure the fabrication of the entire optics assembly of an EUV micro exposure tool.

Influence of high power 405 nm multi-mode and single-mode diode laser light on the long-term stability of fused silica fibers

NASA Astrophysics Data System (ADS)

Gonschior, C. P.; Klein, K.-F.; Sun, T.; Grattan, K. T. V.

2012-04-01

As the demand for high power fiber-coupled violet laser systems increases existing problems remain. The typical power of commercially available diode lasers around 400 nm is in the order of 100 to 300 mW, depending on the type of laser. But in combination with the small core of single-mode fibers reduced spot sizes are needed for good coupling efficiencies, leading to power densities in the MW/cm2 range. We investigated the influence of 405 nm laser light irradiation on different fused silica fibers and differently treated end-faces. The effect of glued-and-polished, cleaved-and-clamped and of cleaved-and-fusion-arc-treated fiber end-faces on the damage rate and behavior are presented. In addition, effects in the deep ultra-violet were determined spectrally using newest spectrometer technology, allowing the measurement of color centers around 200 nm in small core fibers. Periodic surface structures were found on the proximal end-faces and were investigated concerning generation control parameters and composition. The used fiber types range from low-mode fiber to single-mode and polarization-maintaining fiber. For this investigation 405 nm single-mode or multi-mode diode lasers with 150 mW or 300 mW, respectively, were employed.

Quantum Structure of Space and Time

NASA Astrophysics Data System (ADS)

Duff, M. J.; Isham, C. J.

2012-07-01

Foreword Abdus Salam; Preface; List of participants; Part I. Quantum Gravity, Fields and Topology: 1. Some remarks on gravity and quantum mechanics Roger Penrose; 2. An experimental test of quantum gravity Don N. Page and C. D. Geilker; 3. Quantum mechanical origin of the sandwich theorem in classical gravitation theory Claudio Teitelboim; 4. θ-States induced by the diffeomorphism group in canonically quantized gravity C. J. Isham; 5. Strong coupling quantum gravity: an introduction Martin Pilati; 6. Quantizing fourth order gravity theories S. M. Christensen; 7. Green's functions, states and renormalisation M. R. Brown and A. C. Ottewill; 8. Introduction to quantum regge calculus Martin Roček and Ruth Williams; 9. Spontaneous symmetry breaking in curved space-time D. J. Toms; 10. Spontaneous symmetry breaking near a black hole M. S. Fawcett and B. F. Whiting; 11. Yang-Mills vacua in a general three-space G. Kunstatter; 12. Fermion fractionization in physics R. Jackiw; Part II. Supergravity: 13. The new minimal formulation of N=1 supergravity and its tensor calculus M. F. Sohnius and P. C. West; 14. A new deteriorated energy-momentum tensor M. J. Duff and P. K. Townsend; 15. Off-shell N=2 and N=4 supergravity in five dimensions P. Howe; 16. Supergravity in high dimensions P. van Niewenhuizen; 17. Building linearised extended supergravities J. G. Taylor; 18. (Super)gravity in the complex angular momentum plane M. T. Grisaru; 19. The multiplet structure of solitons in the O(2) supergravity theory G. W. Gibbons; 20. Ultra-violet properties of supersymmetric gauge theory S. Ferrara; 21. Extended supercurrents and the ultra-violet finiteness of N=4 supersymmetric Yang-Mills theories K. S. Stelle; 22. Duality rotations B. Zumino; Part III. Cosmology and the Early Universe: 23. Energy, stability and cosmological constant S. Deser; 24. Phase transitions in the early universe T. W. B. Kibble; 25. Complete cosmological theories L. P. Grishchuk and Ya. B. Zeldovich; 26. The cosmological constant and the weak anthropic principle S. W. Hawking.

Measuring SO2 ship emissions with an ultra-violet imaging camera

NASA Astrophysics Data System (ADS)

Prata, A. J.

2013-11-01

Over the last few years fast-sampling ultra-violet (UV) imaging cameras have been developed for use in measuring SO2 emissions from industrial sources (e.g. power plants; typical fluxes ~1-10 kg s-1) and natural sources (e.g. volcanoes; typical fluxes ~10-100 kg s-1). Generally, measurements have been made from sources rich in SO2 with high concentrations and fluxes. In this work, for the first time, a UV camera has been used to measure the much lower concentrations and fluxes of SO2 (typical fluxes ~0.01-0.1 kg s-1) in the plumes from moving and stationary ships. Some innovations and trade-offs have been made so that estimates of the fluxes and path concentrations can be retrieved in real-time. Field experiments were conducted at Kongsfjord in Ny Ålesund, Svalbard, where emissions from cruise ships were made, and at the port of Rotterdam, Netherlands, measuring emissions from more than 10 different container and cargo ships. In all cases SO2 path concentrations could be estimated and fluxes determined by measuring ship plume speeds simultaneously using the camera, or by using surface wind speed data from an independent source. Accuracies were compromised in some cases because of the presence of particulates in some ship emissions and the restriction of single-filter UV imagery, a requirement for fast-sampling (>10 Hz) from a single camera. Typical accuracies ranged from 10-30% in path concentration and 10-40% in flux estimation. Despite the ease of use and ability to determine SO2 fluxes from the UV camera system, the limitation in accuracy and precision suggest that the system may only be used under rather ideal circumstances and that currently the technology needs further development to serve as a method to monitor ship emissions for regulatory purposes.

Evolution of Structural and Optical Properties of ZnO Nanorods Grown on Vacuum Annealed Seed Crystallites

PubMed Central

Khan, Fasihullah; Ajmal, Hafiz Muhammad Salman; Huda, Noor Ul; Kim, Ji Hyun; Kim, Sam-Dong

2018-01-01

In this study, the ambient condition for the as-coated seed layer (SL) annealing at 350 °C is varied from air or nitrogen to vacuum to examine the evolution of structural and optical properties of ZnO nanorods (NRs). The NR crystals of high surface density (~240 rods/μm2) and aspect ratio (~20.3) show greatly enhanced (002) degree of orientation and crystalline quality, when grown on the SLs annealed in vacuum, compared to those annealed in air or nitrogen ambient. This is due to the vacuum-annealed SL crystals of a highly preferred orientation toward (002) and large grain sizes. X-ray photoelectron spectroscopy also reveals that the highest O/Zn atomic ratio of 0.89 is obtained in the case of vacuum-annealed SL crystals, which is due to the effective desorption of hydroxyl groups and other contaminants adsorbed on the surface formed during aqueous solution-based growth process. Near band edge emission (ultra violet range of 360–400 nm) of the vacuum-annealed SLs is also enhanced by 44% and 33% as compared to those annealed in air and nitrogen ambient, respectively, in photoluminescence with significant suppression of visible light emission associated with deep level transition. Due to this improvement of SL optical crystalline quality, the NR crystals grown on the vacuum-annealed SLs produce ~3 times higher ultra violet emission intensity than the other samples. In summary, it is shown that the ZnO NRs preferentially grow along the wurtzite c-axis direction, thereby producing the high crystalline quality of nanostructures when they grow on the vacuum-annealed SLs of high crystalline quality with minimized impurities and excellent preferred orientation. The ZnO nanostructures of high crystalline quality achieved in this study can be utilized for a wide range of potential device applications such as laser diodes, light-emitting diodes, piezoelectric transducers and generators, gas sensors, and ultraviolet detectors. PMID:29373523

Influence of Li+ charge compensator ion on the energy transfer from Pr3 + to Gd3 + ions in Ca9Mg(PO4)6F2:Gd3 +, Pr3 +, Li+ phosphor

NASA Astrophysics Data System (ADS)

Tamboli, Sumedha; Dhoble, S. J.

2017-09-01

Phototherapy is a renowned treatment for curing skin diseases since ancient times. Phototherapeutic treatment for psoriasis and many other diseases require narrow band ultra violet-B (NB-UVB) light with peak intensity at 313 nm to be exposed to the affected part of body. In this paper, we report combustion synthesis of NB-UVB - 313 nm emitting Ca9Mg(PO4)6F2 phosphors doped with Gd3 +, Pr3 + and Li+ ions. The phase formation was confirmed by obtaining X-ray diffraction (XRD) pattern and morphology was studied with the Scanning electron microscopy (SEM) images. Photoluminescence (PL) emission spectra show intense narrow band emission at 313 nm under 274 nm excitation wavelengths. Emission intensity was enhanced when Ca9Mg(PO4)6F2 compound is co-doped with Pr3 + ions. Excitation spectra of Ca9Mg(PO4)6F2:Gd3 +, Pr3 + doped samples shows broad excitation in ultra violet C (UVC) region. Diffuse reflectance spectra (DRS), obtained by UV-visible spectrophotometer, measures the absorption properties of the material. By applying Kubelka Munk function on the diffuse reflectance spectra, band gap of the material is determined. PL decay curves were examined which indicates efficient energy transfer between Pr3 + and Gd3 + ions. Charge compensation effect was also studied by co-doping Li+ ion in host. Emission intensity was found to increase with the addition of charge compensator. The prepared phosphor has potential to convert UVC light into NB-UVB. The luminescence intensity of Gd3 + shows remarkable increase when it is sensitized with Pr3 +, and an addition of charge compensator in the form of Li+, show even better results. This phosphor surely has the potential to be used as phototherapy lamp phosphor.

EDGES and the Development of Absolute Calibration for Wideband Radio Receivers for 21cm Cosmology

NASA Astrophysics Data System (ADS)

Bowman, Judd D.

2018-06-01

The ultra-violet light emitted by early stars, when the universe was less than 400 million years old, alters the excitation state of the 21cm hyperfine line of primordial neutral hydrogen gas that surrounds the stars. This causes the gas to absorb photons from the cosmic microwave background (CMB). Later, energy deposited into the gas by the ultra-violet and X-ray emission from these early stars and their remnants heats the gas and eventually ionizes it. These effects produce spectral features in the CMB observable today at frequencies redshifted to below 200 MHz. The 21cm signal is approximately 10,000 times fainter the foreground synchrotron emission from the Milky Way, leading to the requirement that any instrument designed to observe it must have a knowable response at the 0.01% level. Typical radio receivers used in astronomical measurements are accurate at the 1-10% level. Over the last decade, our team has investigated new radio receiver designs and accurate calibration strategies in the laboratory and in ground-based instruments to achieve the 0.01% performance goal. Building on these efforts, we recently reported evidence for detection of the redshifted 21cm signal as a decrease in the sky-averaged radio intensity observed by the Experiment to Detect the Global EoR Signature (EDGES). We found a flattened absorption profile in the measured radio spectrum centered at a frequency of 78 MHz with full width at half maximum of 19 MHz and an amplitude of 0.5 K. The frequency of the profile is roughly consistent with astrophysical models of early star formation. However, the amplitude of the observed profile is more than a factor of two greater than the largest standard predictions and suggests that the gas was either significantly colder than expected or the background radiation temperature was hotter than expected.

Status of EUVL mask development in Europe (Invited Paper)

NASA Astrophysics Data System (ADS)

Peters, Jan H.

2005-06-01

EUV lithography is the prime candidate for the next generation lithography technology after 193 nm immersion lithography. The commercial onset for this technology is expected for the 45 nm half-pitch technology or below. Several European and national projects and quite a large number of companies and research institutions in Europe work on various aspects of the technological challenges to make EUV a commercially viable technology in the not so far future. Here the development of EUV sources, the development of an EUV exposure tools, metrology tools dedicated for characterization of mask, the production of EUV mask blanks and the mask structuring itself are the key areas in which major activities can be found. In this talk we will primarily focus on those activities, which are related to establish an EUV mask supply chain with all its ingredients from substrate production, polishing, deposition of EUV layers, blank characterization, mask patterning process and the consecutive metrology and defect inspection as well as shipping and handling from blank supply to usage in the wafer fab. The EUV mask related projects on the national level are primarily supported by the French Ministry of Economics and Finance (MinEFi) and the German Ministry of Education and Research (BMBF).

EUV laser produced and induced plasmas for nanolithography

NASA Astrophysics Data System (ADS)

Sizyuk, Tatyana; Hassanein, Ahmed

2017-10-01

EUV produced plasma sources are being extensively studied for the development of new technology for computer chips production. Challenging tasks include optimization of EUV source efficiency, producing powerful source in 2 percentage bandwidth around 13.5 nm for high volume manufacture (HVM), and increasing the lifetime of collecting optics. Mass-limited targets, such as small droplet, allow to reduce contamination of chamber environment and mirror surface damage. However, reducing droplet size limits EUV power output. Our analysis showed the requirement for the target parameters and chamber conditions to achieve 500 W EUV output for HVM. The HEIGHTS package was used for the simulations of laser produced plasma evolution starting from laser interaction with solid target, development and expansion of vapor/plasma plume with accurate optical data calculation, especially in narrow EUV region. Detailed 3D modeling of mix environment including evolution and interplay of plasma produced by lasers from Sn target and plasma produced by in-band and out-of-band EUV radiation in ambient gas, used for the collecting optics protection and cleaning, allowed predicting conditions in entire LPP system. Effect of these conditions on EUV photon absorption and collection was analyzed. This work is supported by the National Science Foundation, PIRE project.

Ultra preconcentration of polycyclic aromatic hydrocarbons in smoked bacon by a combination of SPE and DLLME.

PubMed

Liu, Xiaofang; Zhou, Shu; Zhu, Quanfei; Ye, Yong; Chen, Huaixia

2014-09-01

A sample pretreatment method, solid-phase extraction combined with dispersive liquid-liquid microextraction (SPE-DLLME), was established for the sensitive determination of polycyclic aromatic hydrocarbons (PAHs) in smoked bacon samples. In the SPE-DLLME process, three PAHs including naphthalene (Naph), phenanthrene (Phen) and pyrene (Pyr) were extracted from samples and transferred into C18 SPE cartridge. The target analytes were subsequently eluted with 1.2 ml of acetonitrile-dichloromethane (5:1, v/v) mixture solution. The eluent was injected directly into the 5.0 ml ultrapure water in the subsequent DLLME procedure. The sedimented phase was concentrated under a gentle nitrogen flow to 120.0 µl. Finally, the analytes in the extraction solvent were determined by high-performance liquid chromatography with a ultra-violet detector. Some important extraction parameters affecting the performance, such as the sample solution flow rate, breakthrough volume, salt addition as well as the type and volume of the elution solvent were optimized. The developed method provided an ultra enrichment factors for PAHs ranged from 3478 to 3824. The method was applied for the selective extraction and sensitive determination of PAHs in smoked bacon samples. The limits of detection (S/N = 3) were 0.05, 0.01, 0.02 μg kg(-1) for Naph, Phen, Pyr, respectively. © The Author [2013]. Published by Oxford University Press. All rights reserved. For Permissions, please email: journals.permissions@oup.com.

Extreme ultraviolet spectroscopy diagnostics of low-temperature plasmas based on a sliced multilayer grating and glass capillary optics.

PubMed

Kantsyrev, V L; Safronova, A S; Williamson, K M; Wilcox, P; Ouart, N D; Yilmaz, M F; Struve, K W; Voronov, D L; Feshchenko, R M; Artyukov, I A; Vinogradov, A V

2008-10-01

New extreme ultraviolet (EUV) spectroscopic diagnostics of relatively low-temperature plasmas based on the application of an EUV spectrometer and fast EUV diodes combined with glass capillary optics is described. An advanced high resolution dispersive element sliced multilayer grating was used in the compact EUV spectrometer. For monitoring of the time history of radiation, filtered fast EUV diodes were used in the same spectral region (>13 nm) as the EUV spectrometer. The radiation from the plasma was captured by using a single inexpensive glass capillary that was transported onto the spectrometer entrance slit and EUV diode. The use of glass capillary optics allowed placement of the spectrometer and diodes behind the thick radiation shield outside the direction of a possible hard x-ray radiation beam and debris from the plasma source. The results of the testing and application of this diagnostic for a compact laser plasma source are presented. Examples of modeling with parameters of plasmas are discussed.

Mechanisms of EUV exposure: electrons and holes

NASA Astrophysics Data System (ADS)

Narasimhan, Amrit; Grzeskowiak, Steven; Ackerman, Christian; Flynn, Tracy; Denbeaux, Greg; Brainard, Robert L.

2017-03-01

In extreme ultraviolet (EUV) lithography, 92 eV photons are used to expose photoresists. Current EUV photoresists are composed of photoacid generators (PAGs) in polymer matrices. Secondary electrons (2 - 80 eV) created in resists during EUV exposure play large role in acid-production. There are several proposed mechanisms for electron-resist interactions: internal excitation, electron trapping, and hole-initiated chemistry. Here, we will address two central questions in EUV resist research: (1) How many electrons are generated per EUV photon absorption? (2) By which mechanisms do these electrons interact and react with molecules in the resist? We will use this framework to evaluate the contributions of electron trapping and hole initiated chemistry to acid production in chemically amplified photoresists, with specific emphasis on the interdependence of these mechanisms. We will show measurements of acid yield from direct bulk electrolysis of PAGs and EUV exposures of PAGs in phenolic and nonphenolic polymers to narrow down the mechanistic possibilities in chemically amplified resists.

Solar EUV irradiance for space weather applications

NASA Astrophysics Data System (ADS)

Viereck, R. A.

2015-12-01

Solar EUV irradiance is an important driver of space weather models. Large changes in EUV and x-ray irradiances create large variability in the ionosphere and thermosphere. Proxies such as the F10.7 cm radio flux, have provided reasonable estimates of the EUV flux but as the space weather models become more accurate and the demands of the customers become more stringent, proxies are no longer adequate. Furthermore, proxies are often provided only on a daily basis and shorter time scales are becoming important. Also, there is a growing need for multi-day forecasts of solar EUV irradiance to drive space weather forecast models. In this presentation we will describe the needs and requirements for solar EUV irradiance information from the space weather modeler's perspective. We will then translate these requirements into solar observational requirements such as spectral resolution and irradiance accuracy. We will also describe the activities at NOAA to provide long-term solar EUV irradiance observations and derived products that are needed for real-time space weather modeling.

First environmental data from the EUV engineering test stand

NASA Astrophysics Data System (ADS)

Klebanoff, Leonard E.; Malinowski, Michael E.; Grunow, Philip A.; Clift, W. Miles; Steinhaus, Chip; Leung, Alvin H.; Haney, Steven J.

2001-08-01

The first environmental data from the Engineering Test Stand (ETS) has been collected. Excellent control of high-mass hydrocarbons has been observed. This control is a result of extensive outgas testing of components and materials, vacuum compatible design of the ETS, careful cleaning of parts and pre-baking of cables and sub assemblies where possible, and clean assembly procedures. As a result of the hydrocarbon control, the residual ETS vacuum environment is rich in water vapor. Analysis of witness plate data indicates that the ETS environment does not pose a contamination risk to the optics in the absence of EUV irradiation. However, with EUV exposure, the water rich environment can lead to EUV- induced water oxidation of the Si-terminated Mo/Si optics. Added ethanol can prevent optic oxidation, allowing carbon growth via EUV cracking of low-level residual hydrocarbons to occur. The EUV environmental issues are understood, mitigation approaches have been validated, and EUV optic contamination appears to be manageable.

Design and pitch scaling for affordable node transition and EUV insertion scenario

NASA Astrophysics Data System (ADS)

Kim, Ryoung-han; Ryckaert, Julien; Raghavan, Praveen; Sherazi, Yasser; Debacker, Peter; Trivkovic, Darko; Gillijns, Werner; Tan, Ling Ee; Drissi, Youssef; Blanco, Victor; Bekaert, Joost; Mao, Ming; Larivière, Stephane; McIntyre, Greg

2017-04-01

imec's DTCO and EUV achievement toward imec 7nm (iN7) technology node which is industry 5nm node equivalent is reported with a focus on cost and scaling. Patterning-aware design methodology supports both iArF multiple patterning and EUV under one compliant design rule. FinFET device with contacted poly pitch of 42nm and metal pitch of 32nm with 7.5-track, 6.5-track, and 6-track standard cell library are explored. Scaling boosters are used to provide additional scaling and die cost benefit while lessening pitch shrink burden, and it makes EUV insertion more affordable. EUV pattern fidelity is optimized through OPC, SMO, M3D, mask sizing and SRAF. Processed wafers were characterized and edge-placement-error (EPE) variability is validated for EUV insertion. Scale-ability and cost of ownership of EUV patterning in aligned with iN7 standard cell design, integration and patterning specification are discussed.

Uncovering New Thermal and Elastic Properties of Nanostructured Materials Using Coherent EUV Light

NASA Astrophysics Data System (ADS)

Hernandez Charpak, Jorge Nicolas

Advances in nanofabrication have pushed the characteristic dimensions of nanosystems well below 100nm, where physical properties are often significantly different from their bulk counterparts, and accurate models are lacking. Critical technologies such as thermoelectrics for energy harvesting, nanoparticle-mediated thermal therapy, nano-enhanced photovoltaics, and efficient thermal management in integrated circuits depend on our increased understanding of the nanoscale. However, traditional microscopic characterization tools face fundamental limits at the nanoscale. Theoretical efforts to build a fundamental picture of nanoscale thermal dynamics lack experimental validation and still struggle to account for newly reported behaviors. Moreover, precise characterization of the elastic behavior of nanostructured systems is needed for understanding the unique physics that become apparent in small-scale systems, such as thickness-dependent or fabrication-dependent elastic properties. In essence, our ability to fabricate nanosystems has outstripped our ability to understand and characterize them. In my PhD thesis, I present the development and refinement of coherent extreme ultraviolet (EUV) nanometrology, a novel tool used to probe material properties at the intrinsic time- and length-scales of nanoscale dynamics. By extending ultrafast photoacoustic and thermal metrology techniques to very short probing wavelengths using tabletop coherent EUV beams from high-harmonic upconversion (HHG) of femtosecond lasers, coherent EUV nanometrology allows for a new window into nanoscale physics, previously unavailable with traditional techniques. Using this technique, I was able to probe both thermal and acoustic dynamics in nanostructured systems with characteristic dimensions below 50nm with high temporal (sub-ps) and spatial (<10pm vertical) resolution, including the smallest heat sources probed (20nm) and thinnest film (10.9nm) fully mechanically characterized to date. By probing nanoscale thermal transport (i.e. cooling) of periodic hot nanostructures down to 20nm in characteristic dimension in both 1D (nanolines) and 2D (nanocubes) geometries, I uncovered a new surprising regime of nanoscale thermal transport called the "collectively-diffusive regime". In this regime, nanoscale hot spots cool faster when placed closer together than when farther apart. This is a consequence of the interplay between both the size and spacing of the nanoscale heat sources with the phonon spectrum of a material. This makes our technique one of the only experimental routes to directly probe the dynamics of phonons in complex materials, which is critical to both technological applications and fundamental condensed matter physics. I developed a proof of concept model and used it to extract the first experimental differential conductivity phonon mean free path (MFP) spectra for silicon and sapphire, which compare well with first-principles calculations. However, a complete picture of the physics is still elusive. Thus, I developed a computational solver for the phonon Boltzmann transport equation in realistic experimental geometries. Using this approach, I successfully found confirmation of the influence of the period in thermal transport from periodic heat sources: a smaller periodicity can enhance the heat dissipation efficiency. This result is qualitatively consistent with the results of the "collectively-diffusive regime", but more work is needed for a full theoretical quantitative picture of the experimental results. In other work, I used coherent EUV nanometrology to simultaneously measure, in a non-contact and non-destructive way, Young's modulus and, for the first time, Poisson's ratio of ultra-thin films. I successfully extracted the full elastic tensor of the thinnest films to date (10.9nm). Moreover, by using our technique on a series of low-k dielectric sub-100 nm SiC:H films, I uncovered an unexpected transition from compressible to non-compressible behavior. This new behavior is observed for materials whose network connectivity had been modified through hydrogenation (that breaks bonds in order to decrease the dielectric constant of these materials). This finding demonstrates that coherent EUV nanometrology provides a valuable, quantitative new tool for measuring nanomaterial properties with dimensions an order of magnitude smaller than what was possible with traditional techniques. I also present here some of my written work on science and technology policy studies. I present my thoughts on the Kuhnian model of scientific revolutions and how it relates to my own experience. I also discuss two case studies to illustrate the critical importance of defining appropriate metrics to measure science policies by looking at the design of metrics for the American Reinvestment and Recovery Act, and the results of exploring a novel modality of funding for large complex scientific and technological challenges: the US Department of Energy Innovation HUBs. Coherent EUV nanometrology presents an exciting new window into nanoscale phonon dynamics, making measurements of the phonon MFP spectrum of materials and the full elastic tensor of ultra-thin films possible. It is now a robust technique that is already having impact in many areas of materials science and condensed matter physics, and it will continue to do so in the future.

CXRO - Mi-Young Im, Staff Scientist

Science.gov Websites

X-Ray Database Zone Plate Education Nanomagnetism X-Ray Microscopy LDJIM EUV Lithography EUV Mask Publications Contact The Center for X-Ray Optics is a multi-disciplined research group within Lawrence Berkeley -Ray Optics X-Ray Database Nanomagnetism X-Ray Microscopy EUV Lithography EUV Mask Imaging

Discovery of Strong EUV-induced Balmer Emission in the New WD+dM Binary EUVE J2013+40.0 (RE 2013+400)

NASA Astrophysics Data System (ADS)

Thorstensen, J. R.; Vennes, S.

1993-12-01

The binary system EUVE J2013+40.0 (= RE 2013+400) was discovered in the EUV-selected sample of white dwarfs identified in the course of the ROSAT Wide Field Camera (WFC) all-sky survey (Pounds et al. 1993, MNRAS, 260, 77). The intense extreme ultraviolet (EUV) emission from the hot white dwarf (DAO type) was also detected in the course of the Extreme Ultraviolet Explorer (EUVE) all-sky survey (Bowyer et al. 1993, ApJ, submitted), and the subsequent optical identification campaign suggested the association of EUVE J2013+40.0 with the Feige 24 class of binary systems (see Vennes & Thorstensen, these proceedings). Such systems consist of a hot H-rich white dwarf (DA/DAO) and a red dwarf companion (dM) and are characterized by strong, narrow, variable Balmer emission. We obtained spectroscopy with 4 Angstroms resolution at the Michigan-Dartmouth-MIT Hiltner 2.4 m, covering the Hα and Hβ range. The Hα emission line velocity and equivalent widths varied with a period of 0.708 +/- 0.003 d; the velocity semiamplitude is 89 +/- 3 km s(-1) . The emission equivalent width reaches maximum strength 0.251 +/- 0.007 cycle after maximum emission-line velocity, that is, when the emission source reaches superior conjunction. This is just as expected if the emission arises from reprocessing of the EUV radiation incident upon the face of the dM star facing the white dwarf, as proposed for Feige 24 by Thorstensen et al. (1978, ApJ, 223, 260). EUVE J2013+40.0 is one of a handful of WD+dM binary systems in which the illumination effect is observed with unambiguous clarity. By comparing Feige 24 and EUVE J2013+40.0, and modelling the white dwarf EUV emission and red dwarf Balmer emission, we constrain the orbital inclinations. Additional spectroscopy of EUVE J2013+40.0 is being scheduled to determine the component masses. These are important input data for the study of the close binary systems which arise from common envelope evolution. This work is supported by a forthcoming NASA Guest Observer grant.

EUV mask manufacturing readiness in the merchant mask industry

NASA Astrophysics Data System (ADS)

Green, Michael; Choi, Yohan; Ham, Young; Kamberian, Henry; Progler, Chris; Tseng, Shih-En; Chiou, Tsann-Bim; Miyazaki, Junji; Lammers, Ad; Chen, Alek

2017-10-01

As nodes progress into the 7nm and below regime, extreme ultraviolet lithography (EUVL) becomes critical for all industry participants interested in remaining at the leading edge. One key cost driver for EUV in the supply chain is the reflective EUV mask. As of today, the relatively few end users of EUV consist primarily of integrated device manufactures (IDMs) and foundries that have internal (captive) mask manufacturing capability. At the same time, strong and early participation in EUV by the merchant mask industry should bring value to these chip makers, aiding the wide-scale adoption of EUV in the future. For this, merchants need access to high quality, representative test vehicles to develop and validate their own processes. This business circumstance provides the motivation for merchants to form Joint Development Partnerships (JDPs) with IDMs, foundries, Original Equipment Manufacturers (OEMs) and other members of the EUV supplier ecosystem that leverage complementary strengths. In this paper, we will show how, through a collaborative supplier JDP model between a merchant and OEM, a novel, test chip driven strategy is applied to guide and validate mask level process development. We demonstrate how an EUV test vehicle (TV) is generated for mask process characterization in advance of receiving chip maker-specific designs. We utilize the TV to carry out mask process "stress testing" to define process boundary conditions which can be used to create Mask Rule Check (MRC) rules as well as serve as baseline conditions for future process improvement. We utilize Advanced Mask Characterization (AMC) techniques to understand process capability on designs of varying complexity that include EUV OPC models with and without sub-resolution assist features (SRAFs). Through these collaborations, we demonstrate ways to develop EUV processes and reduce implementation risks for eventual mass production. By reducing these risks, we hope to expand access to EUV mask capability for the broadest community possible as the technology is implemented first within and then beyond the initial early adopters.

From powerful research platform for industrial EUV photoresist development, to world record resolution by photolithography: EUV interference lithography at the Paul Scherrer Institute

NASA Astrophysics Data System (ADS)

Buitrago, Elizabeth; Fallica, Roberto; Fan, Daniel; Karim, Waiz; Vockenhuber, Michaela; van Bokhoven, Jeroen A.; Ekinci, Yasin

2016-09-01

Extreme ultraviolet interference lithography (EUV-IL, λ = 13.5 nm) has been shown to be a powerful technique not only for academic, but also for industrial research and development of EUV materials due to its relative simplicity yet record high-resolution patterning capabilities. With EUV-IL, it is possible to pattern high-resolution periodic images to create highly ordered nanostructures that are difficult or time consuming to pattern by electron beam lithography (EBL) yet interesting for a wide range of applications such as catalysis, electronic and photonic devices, and fundamental materials analysis, among others. Here, we will show state-of the-art research performed using the EUV-IL tool at the Swiss Light Source (SLS) synchrotron facility in the Paul Scherrer Institute (PSI). For example, using a grating period doubling method, a diffraction mask capable of patterning a world record in photolithography of 6 nm half-pitch (HP), was produced. In addition to the description of the method, we will give a few examples of applications of the technique. Well-ordered arrays of suspended silicon nanowires down to 6.5 nm linewidths have been fabricated and are to be studied as field effect transistors (FETs) or biosensors, for instance. EUV achromatic Talbot lithography (ATL), another interference scheme that utilizes a single grating, was shown to yield well-defined nanoparticles over large-areas with high uniformity presenting great opportunities in the field of nanocatalysis. EUV-IL is in addition, playing a key role in the future introduction of EUV lithography into high volume manufacturing (HVM) of semiconductor devices for the 7 and 5 nm logic node (16 nm and 13 nm HP, respectively) and beyond while the availability of commercial EUV-tools is still very much limited for research.

Energy deposition in ultrathin extreme ultraviolet resist films: extreme ultraviolet photons and keV electrons

NASA Astrophysics Data System (ADS)

Kyser, David F.; Eib, Nicholas K.; Ritchie, Nicholas W. M.

2016-07-01

The absorbed energy density (eV/cm3) deposited by extreme ultraviolet (EUV) photons and electron beam (EB) high-keV electrons is proposed as a metric for characterizing the sensitivity of EUV resist films. Simulations of energy deposition are used to calculate the energy density as a function of the incident aerial flux (EUV: mJ/cm2, EB: μC/cm2). Monte Carlo calculations for electron exposure are utilized, and a Lambert-Beer model for EUV absorption. The ratio of electron flux to photon flux which results in equivalent energy density is calculated for a typical organic chemically amplified resist film and a typical inorganic metal-oxide film. This ratio can be used to screen EUV resist materials with EB measurements and accelerate advances in EUV resist systems.

SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform

NASA Astrophysics Data System (ADS)

Bekaert, Joost; Di Lorenzo, Paolo; Mao, Ming; Decoster, Stefan; Larivière, Stéphane; Franke, Joern-Holger; Blanco Carballo, Victor M.; Kutrzeba Kotowska, Bogumila; Lazzarino, Frederic; Gallagher, Emily; Hendrickx, Eric; Leray, Philippe; Kim, R. Ryoung-han; McIntyre, Greg; Colsters, Paul; Wittebrood, Friso; van Dijk, Joep; Maslow, Mark; Timoshkov, Vadim; Kiers, Ton

2017-03-01

The imec N7 (iN7) platform has been developed to evaluate EUV patterning of advanced logic BEOL layers. Its design is based on a 42 nm first-level metal (M1) pitch, and a 32 nm pitch for the subsequent M2 layer. With these pitches, the iN7 node is an `aggressive' full-scaled N7, corresponding to IDM N7, or foundry N5. Even in a 1D design style, single exposure of the 16 nm half-pitch M2 layer is very challenging for EUV lithography, because of its tight tip-to-tip configurations. Therefore, the industry is considering the hybrid use of ArFi-based SAQP combined with EUV Block as an alternative to EUV single exposure. As a consequence, the EUV Block layer may be one of the first layers to adopt EUV lithography in HVM. In this paper, we report on the imec iN7 SAQP + Block litho performance and process integration, targeting the M2 patterning for a 7.5 track logic design. The Block layer is exposed on an ASML NXE:3300 EUV-scanner at imec, using optimized illumination conditions and state-of-the-art metal-containing negative tone resist (Inpria). Subsequently, the SAQP and block structures are characterized in a morphological study, assessing pattern fidelity and CD/EPE variability. The work is an experimental feasibility study of EUV insertion, for SAQP + Block M2 patterning on an industry-relevant N5 use-case.

EUVS Sounding Rocket Payload

NASA Technical Reports Server (NTRS)

Stern, Alan S.

1996-01-01

During the first half of this year (CY 1996), the EUVS project began preparations of the EUVS payload for the upcoming NASA sounding rocket flight 36.148CL, slated for launch on July 26, 1996 to observe and record a high-resolution (approx. 2 A FWHM) EUV spectrum of the planet Venus. These preparations were designed to improve the spectral resolution and sensitivity performance of the EUVS payload as well as prepare the payload for this upcoming mission. The following is a list of the EUVS project activities that have taken place since the beginning of this CY: (1) Applied a fresh, new SiC optical coating to our existing 2400 groove/mm grating to boost its reflectivity; (2) modified the Ranicon science detector to boost its detective quantum efficiency with the addition of a repeller grid; (3) constructed a new entrance slit plane to achieve 2 A FWHM spectral resolution; (4) prepared and held the Payload Initiation Conference (PIC) with the assigned NASA support team from Wallops Island for the upcoming 36.148CL flight (PIC held on March 8, 1996; see Attachment A); (5) began wavelength calibration activities of EUVS in the laboratory; (6) made arrangements for travel to WSMR to begin integration activities in preparation for the July 1996 launch; (7) paper detailing our previous EUVS Venus mission (NASA flight 36.117CL) published in Icarus (see Attachment B); and (8) continued data analysis of the previous EUVS mission 36.137CL (Spica occultation flight).

Forming aspheric optics by controlled deposition

DOEpatents

Hawryluk, A.M.

1998-04-28

An aspheric optical element is disclosed formed by depositing material onto a spherical surface of an optical element by controlled deposition to form an aspheric surface of desired shape. A reflecting surface, single or multi-layer, can then be formed on the aspheric surface by evaporative or sputtering techniques. Aspheric optical elements are suitable for deep ultra-violet (UV) and x-ray wavelengths. The reflecting surface may, for example, be a thin ({approx}100 nm) layer of aluminum, or in some cases the deposited modifying layer may function as the reflecting surface. For certain applications, multi-layer reflective surfaces may be utilized, such as chromium-carbon or tungsten-carbon multi-layer, with the number of layers and thickness being determined by the intended application. 4 figs.

Forming aspheric optics by controlled deposition

DOEpatents

Hawryluk, Andrew M.

1998-01-01

An aspheric optical element formed by depositing material onto a spherical surface of an optical element by controlled deposition to form an aspheric surface of desired shape. A reflecting surface, single or multi-layer, can then be formed on the aspheric surface by evaporative or sputtering techniques. Aspheric optical elements are suitable for deep ultra-violet (UV) and x-ray wavelengths. The reflecting surface may, for example, be a thin (.about.100 nm) layer of aluminum, or in some cases the deposited modifying layer may function as the reflecting surface. For certain applications, multi-layer reflective surfaces may be utilized, such as chromium-carbon or tungsten-carbon multi-layer, with the number of layers and thickness being determined by the intended application.

Buffer for a gamma-insensitive optical sensor with gas and a buffer assembly

DOEpatents

Kruger, Hans W.

1994-01-01

A buffer assembly for a gamma-insensitive gas avalanche focal plane array operating in the ultra-violet/visible/infrared energy wavelengths and using a photocathode and an avalanche gas located in a gap between an anode and the photocathode. The buffer assembly functions to eliminate chemical compatibility between the gas composition and the materials of the photocathode. The buffer assembly in the described embodiment is composed of two sections, a first section constructed of glass honeycomb under vacuum and a second section defining a thin barrier film or membrane constructed, for example, of Al and Be, which is attached to and supported by the honeycomb. The honeycomb section, in turn, is supported by and adjacent to the photocathode.

Velocity-gauge real-time TDDFT within a numerical atomic orbital basis set

NASA Astrophysics Data System (ADS)

Pemmaraju, C. D.; Vila, F. D.; Kas, J. J.; Sato, S. A.; Rehr, J. J.; Yabana, K.; Prendergast, David

2018-05-01

The interaction of laser fields with solid-state systems can be modeled efficiently within the velocity-gauge formalism of real-time time dependent density functional theory (RT-TDDFT). In this article, we discuss the implementation of the velocity-gauge RT-TDDFT equations for electron dynamics within a linear combination of atomic orbitals (LCAO) basis set framework. Numerical results obtained from our LCAO implementation, for the electronic response of periodic systems to both weak and intense laser fields, are compared to those obtained from established real-space grid and Full-Potential Linearized Augmented Planewave approaches. Potential applications of the LCAO based scheme in the context of extreme ultra-violet and soft X-ray spectroscopies involving core-electronic excitations are discussed.

Plume characteristics and dynamics of UV and IR laser-desorbed oligonucleotides.

PubMed

Merrigan, Tony L; Timson, David J; Hunniford, C Adam; Catney, Martin; McCullough, Robert W

2012-05-01

Laser desorption of dye-tagged oligonucleotides was studied using laser-induced fluorescence imaging. Desorption with ultra violet (UV) and infra-red (IR) lasers resulted in forward directed plumes of molecules. In the case of UV desorption, the initial shot desorbed approximately seven-fold more material than subsequent shots. In contrast, the initial shot in IR desorption resulted in the ejection of less material compared to subsequent shots and these plumes had a component directed along the path of the laser. Thermal equilibrium of the molecules in the plume was achieved after approximately 25 μs with a spread in molecular temperature which was described by a modified Maxwell-Boltzmann equation. Copyright © 2012 Elsevier B.V. All rights reserved.

Raman microspectrometric investigation of wall paintings in S. Giovanni Evangelista Abbey in Parma: a comparison between two artists of the 16th century

NASA Astrophysics Data System (ADS)

Bersani, Danilo; Antonioli, Gianni; Lottici, Pier Paolo; Casoli, Antonella

2003-08-01

Micro-Raman spectroscopy, combined with gas chromatography and ultra-violet fluorescence photography, was used to study some wall paintings in the S. Giovanni Evangelista Abbey in Parma, Italy. The restoration of some painted chapels enabled a comparison between two painters of the 16th century: Parmigianino (Girolamo Francesco Maria Mazzola, 1503-1540) and Michelangelo Anselmi (1492?-1556?). Micro-Raman spectroscopy determined the palette used by the artists, leading to the identification of different white, yellow, red, brown, green, blue and black pigments. Some pigments are evidence of later restorations. Gas chromatography combined with mass spectroscopy revealed the presence of organic binding media and enabled to distinguish between fresco and secco paintings.

Enhanced light extraction in tunnel junction-enabled top emitting UV LEDs

DOE PAGES

Zhang, Yuewei; Allerman, Andrew A.; Krishnamoorthy, Sriram; ...

2016-04-11

The efficiency of ultra violet LEDs has been critically limited by the absorption losses in p-type and metal layers. In this work, surface roughening based light extraction structures are combined with tunneling based p-contacts to realize highly efficient top-side light extraction efficiency in UV LEDs. Surface roughening of the top n-type AlGaN contact layer is demonstrated using self-assembled Ni nano-clusters as etch mask. The top surface roughened LEDs were found to enhance external quantum efficiency by over 40% for UV LEDs with a peak emission wavelength of 326 nm. The method described here can enable highly efficient UV LEDs withoutmore » the need for complex manufacturing methods such as flip chip bonding.« less

SAXS Combined with UV-vis Spectroscopy and QELS: Accurate Characterization of Silver Sols Synthesized in Polymer Matrices.

PubMed

Bulavin, Leonid; Kutsevol, Nataliya; Chumachenko, Vasyl; Soloviov, Dmytro; Kuklin, Alexander; Marynin, Andrii

2016-12-01

The present work demonstrates a validation of small-angle X-ray scattering (SAXS) combining with ultra violet and visible (UV-vis) spectroscopy and quasi-elastic light scattering (QELS) analysis for characterization of silver sols synthesized in polymer matrices. Polymer matrix internal structure and polymer chemical nature actually controlled the sol size characteristics. It was shown that for precise analysis of nanoparticle size distribution these techniques should be used simultaneously. All applied methods were in good agreement for the characterization of size distribution of small particles (less than 60 nm) in the sols. Some deviations of the theoretical curves from the experimental ones were observed. The most probable cause is that nanoparticles were not entirely spherical in form.

Buffer for a gamma-insensitive optical sensor with gas and a buffer assembly

DOEpatents

Kruger, H.W.

1994-05-10

A buffer assembly is disclosed for a gamma-insensitive gas avalanche focal plane array operating in the ultra-violet/visible/infrared energy wavelengths and using a photocathode and an avalanche gas located in a gap between an anode and the photocathode. The buffer assembly functions to eliminate chemical compatibility between the gas composition and the materials of the photocathode. The buffer assembly in the described embodiment is composed of two sections, a first section constructed of glass honeycomb under vacuum and a second section defining a thin barrier film or membrane constructed, for example, of Al and Be, which is attached to and supported by the honeycomb. The honeycomb section, in turn, is supported by and adjacent to the photocathode. 7 figures.

Using liquid and solid state NMR and photoluminescence to study the synthesis and solubility properties of amine capped silicon nanoparticles.

PubMed

Giuliani, J R; Harley, S J; Carter, R S; Power, P P; Augustine, M P

2007-08-01

Water soluble silicon nanoparticles were prepared by the reaction of bromine terminated silicon nanoparticles with 3-(dimethylamino)propyl lithium and characterized with liquid and solid state nuclear magnetic resonance (NMR) and photoluminescence (PL) spectroscopies. The surface site dependent 29Si chemical shifts and the nuclear spin relaxation rates from an assortment of 1H-29Si heteronuclear solid state NMR experiments for the amine coated reaction product are consistent with both the 1H and 13C liquid state NMR results and routine transmission electron microscopy, ultra-violet/visible, and Fourier transform infrared measurements. PL was used to demonstrate the pH dependent solubility properties of the amine passivated silicon nanoparticles.

Cumulus cloud venting of mixed layer ozone

NASA Technical Reports Server (NTRS)

Ching, J. K. S.; Shipley, S. T.; Browell, E. V.; Brewer, D. A.

1985-01-01

Observations are presented which substantiate the hypothesis that significant vertical exchange of ozone and aerosols occurs between the mixed layer and the free troposphere during cumulus cloud convective activity. The experiments utilized the airborne Ultra-Violet Differential Absorption Lidar (UV-DIAL) system. This system provides simultaneous range resolved ozone concentration and aerosol backscatter profiles with high spatial resolution. Evening transects were obtained in the downwind area where the air mass had been advected. Space-height analyses for the evening flight show the cloud debris as patterns of ozone typically in excess of the ambient free tropospheric background. This ozone excess was approximately the value of the concentration difference between the mixed layer and free troposphere determined from independent vertical soundings made by another aircraft in the afternoon.

Constraints on filament models deduced from dynamical analysis

NASA Technical Reports Server (NTRS)

Simon, G.; Schmieder, B.; Demoulin, P.; Malherbe, J. M.; Poland, A. I.

1986-01-01

The conclusions deduced from simultaneous observations with the Ultra-Violet Spectrometer and Polarimeter (UVSP) on the Solar Maximum Mission satellite, and the Multichannel Subtractive Double Pass (MSPD) spectrographs at Meudon and Pic du Midi observatories are presented. The observations were obtained in 1980 and 1984. All instruments have almost the same field of view and provide intensity and velocity maps at two temperatures. The resolution is approx. 0.5 to 1.5" for H alpha line and 3" for C IV. The high resolution and simultaneity of the two types of observations allows a more accurate description of the flows in prominences as functions of temperature and position. The results put some contraints on the models and show that dynamical aspects must be taken into account.

Separation of toxic metal ions, hydrophilic hydrocarbons, hydrophobic fuel and halogenated hydrocarbons and recovery of ethanol from a process stream

DOEpatents

Kansa, E.J.; Anderson, B.L.; Wijesinghe, A.M.; Viani, B.E.

1999-05-25

This invention provides a process to tremendously reduce the bulk volume of contaminants obtained from an effluent stream produced subsurface remediation. The chemicals used for the subsurface remediation are reclaimed for recycling to the remediation process. Additional reductions in contaminant bulk volume are achieved by the ultra-violet light destruction of halogenated hydrocarbons, and the complete oxidation of hydrophobic fuel hydrocarbons and hydrophilic hydrocarbons. The contaminated bulk volume will arise primarily from the disposal of the toxic metal ions. The entire process is modular, so if there are any technological breakthroughs in one or more of the component process modules, such modules can be readily replaced. 3 figs.

Vulcanism, mercury-sensitized photo-reactions and abiogenetic synthesis - A theoretical treatment

NASA Technical Reports Server (NTRS)

Siegel, S. M.; Siegel, B. Z.

1976-01-01

Attention is called to the photodynamic and thermodynamic properties of Periodic Group IIb elements, most notably Hg, as they relate to ultra-violet sensitization in organic chemical reactions. The energy levels of 6 1P1 and 6 3P1 resonance states and the high vapor pressure (greater than 0.001 mm) of the metal at temperatures as low as 293 K bring Hg with the range of bond dissociation energies in most organic molecules and many inorganics. These capabilities considered together with recent evidence for Hg emission as a regular part of volcanic and geothermal processes provide the basis for a proposal that Hg-sensitized ultraviolet photo-reactions may have played a significant part in abiogenetic organic synthesis on the primative earth.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Guo, Wei, E-mail: wguo2@ncsu.edu; Kirste, Ronny; Bryan, Zachary

Enhanced light extraction efficiency was demonstrated on nanostructure patterned GaN and AlGaN/AlN Multiple-Quantum-Well (MQW) structures using mass production techniques including natural lithography and interference lithography with feature size as small as 100 nm. Periodic nanostructures showed higher light extraction efficiency and modified emission profile compared to non-periodic structures based on integral reflection and angular-resolved transmission measurement. Light extraction mechanism of macroscopic and microscopic nanopatterning is discussed, and the advantage of using periodic nanostructure patterning is provided. An enhanced photoluminescence emission intensity was observed on nanostructure patterned AlGaN/AlN MQW compared to as-grown structure, demonstrating a large-scale and mass-producible pathway to higher lightmore » extraction efficiency in deep-ultra-violet light-emitting diodes.« less

Global-scale Observations of the Limb and Disk (GOLD): Hosted Payload Accommodation on a Commercial Satellite

NASA Astrophysics Data System (ADS)

Lankton, M.; Eastes, R.; McClintock, W. E.; Pang, R.; Caffrey, R.; Krywonos, A.

2013-12-01

The Global-Scale Observations of the Limb and Disk (GOLD) mission will perform unprecedented imaging of the Earth's thermosphere and ionosphere (TI) system from geostationary (GEO) orbit. Flying as a hosted payload on a commercial communications satellite, GOLD takes advantage of the resource margins available in the early years of the commercial mission's planned 15-year life. This hosted payload approach is a pathfinder for cost-effective NASA science missions. The affordable ride to GEO makes it possible for an Explorer-class Mission of Opportunity to perform Far UltraViolet (FUV) imaging of nearly a complete hemisphere on a 30-minute cadence. This global-scale, high cadence imaging will enable GOLD to distinguish between spatial and temporal variations in the TI system caused by geomagnetic storms, variations in solar EUV, and forcing from the lower atmosphere. The most significant difference between developing instrumentation for a NASA-owned mission and accomplishing the same task for a commercial satellite is that communications satellites are procured on a faster schedule - 24 to 36 months from satellite contract to launch - than the instrument development. GOLD has partnered with SES Government Solutions (SES-GS), the comsat mission owner-operator, to define instrument interfaces and requirements that will be included in the eventual Request for Proposal to candidate spacecraft vendors. SES-GS launches 3 to 4 missions per year, which allows the GOLD-SES-GS partnership to match the instrument's launch readiness date with a suitable mission. In addition to making geostationary orbit accessible to a science instrument at relatively low cost, commercial communications satellites provides a host platform with very high reliability and long life, easy access to continuous high-speed data downlink and near-real-time data delivery, and stable pointing. SES-GS operates their satellite from established Telemetry, Tracking and Control (TT&C) centers. The GOLD Science Operations Center at the University of Colorado Laboratory for Atmospheric and Space Physics (LASP) will produce instrument command loads for uplink by the TT&C, receive data from the ground station, monitor instrument state of health, and perform quick-look data processing. The GOLD Science Data Center at the University of Central Florida will produce, distribute and archive science data products.

Extreme Ultraviolet Explorer Bright Source List

NASA Technical Reports Server (NTRS)

Malina, Roger F.; Marshall, Herman L.; Antia, Behram; Christian, Carol A.; Dobson, Carl A.; Finley, David S.; Fruscione, Antonella; Girouard, Forrest R.; Hawkins, Isabel; Jelinsky, Patrick

1994-01-01

Initial results from the analysis of the Extreme Ultraviolet Explorer (EUVE) all-sky survey (58-740 A) and deep survey (67-364 A) are presented through the EUVE Bright Source List (BSL). The BSL contains 356 confirmed extreme ultraviolet (EUV) point sources with supporting information, including positions, observed EUV count rates, and the identification of possible optical counterparts. One-hundred twenty-six sources have been detected longward of 200 A.

How active was solar cycle 22?

NASA Technical Reports Server (NTRS)

Hoegy, W. R.; Pesnell, W. D.; Woods, T. N.; Rottman, G. J.

1993-01-01

Solar EUV observations from the Langmuir probe on Pioneer Venus Orbiter suggest that at EUV wavelengths solar cycle 22 was more active than solar cycle 21. The Langmuir probe, acting as a photodiode, measured the integrated solar EUV flux over a 13 1/2 year period from January 1979 to June 1992, the longest continuous solar EUV measurement. The Ipe EUV flux correlated very well with the SME measurement of L-alpha during the lifetime of SME and with the UARS SOLSTICE L-alpha from October 1991 to June 1992 when the Ipe measurement ceased. Starting with the peak of solar cycle 21, there was good general agreement of Ipe EUV with the 10.7 cm, Ca K, and He 10830 solar indices, until the onset of solar cycle 22. From 1989 to the start of 1992, the 10.7 cm flux exhibited a broad maximum consisting of two peaks of nearly equal magnitude, whereas Ipe EUV exhibited a strong increase during this time period making the second peak significantly higher than the first. The only solar index that exhibits the same increase in solar activity as Ipe EUV and L-alpha during the cycle 22 peak is the total magnetic flux. The case for high activity during this peak is also supported by the presence of very high solar flare intensity.

Low temperature plasmas induced in SF6 by extreme ultraviolet (EUV) pulses

NASA Astrophysics Data System (ADS)

Bartnik, A.; Skrzeczanowski, W.; Czwartos, J.; Kostecki, J.; Fiedorowicz, H.; Wachulak, P.; Fok, T.

2018-06-01

In this work, a comparative study of extreme ultraviolet (EUV) induced low temperature SF6-based plasmas, created using two different irradiation systems, was performed. Both systems utilized laser-produced plasma (LPP) EUV sources. The essential difference between the systems concerned the formation of the driving EUV beam. The first one contained an efficient ellipsoidal EUV collector allowing for focusing of the EUV radiation at a large distance from the LPP source. The spectrum of focused radiation was limited to the long-wavelength part of the total LPP emission, λ > 8 nm, due to the reflective properties of the collector. The second system did not contain any EUV collector. The gas to be ionized was injected in the vicinity of the LPP, at a distance of the order of 10 mm. In both systems, energies of the driving photons were high enough for dissociative ionization of the SF6 molecules and ionization of atoms or even singly charged ions. Plasmas, created due to these processes, were investigated by spectral measurements in the EUV, ultraviolet (UV), and visible (VIS) spectral ranges. These low temperature plasmas were employed for preliminary experiments concerning surface treatment. The formation of pronounced nanostructures on the silicon surface after plasma treatment was demonstrated.

Influence of cloud fraction and snow cover to the variation of surface UV radiation at King Sejong station, Antarctica

NASA Astrophysics Data System (ADS)

Lee, Yun Gon; Koo, Ja-Ho; Kim, Jhoon

2015-10-01

This study investigated how cloud fraction and snow cover affect the variation of surface ultraviolet (UV) radiation by using surface Erythemal UV (EUV) and Near UV (NUV) observed at the King Sejong Station, Antarctica. First the Radiative Amplification Factor (RAF), the relative change of surface EUV according to the total-column ozone amount, is compared for different cloud fractions and solar zenith angles (SZAs). Generally, all cloudy conditions show that the increase of RAF as SZA becomes larger, showing the larger effects of vertical columnar ozone. For given SZA cases, the EUV transmission through mean cloud layer gradually decreases as cloud fraction increases, but sometimes the maximum of surface EUV appears under partly cloudy conditions. The high surface EUV transmittance under broken cloud conditions seems due to the re-radiation of scattered EUV by cloud particles. NUV transmission through mean cloud layer also decreases as cloud amount increases but the sensitivity to the cloud fraction is larger than EUV. Both EUV and NUV radiations at the surface are also enhanced by the snow cover, and their enhancement becomes higher as SZA increases implying the diurnal variation of surface albedo. This effect of snow cover seems large under the overcast sky because of the stronger interaction between snow surface and cloudy sky.

Imaging performance improvement of coherent extreme-ultraviolet scatterometry microscope with high-harmonic-generation extreme-ultraviolet source

NASA Astrophysics Data System (ADS)

Mamezaki, Daiki; Harada, Tetsuo; Nagata, Yutaka; Watanabe, Takeo

2017-06-01

In extreme-ultraviolet (EUV) lithography, the development of a review apparatus for the EUV mask pattern at an exposure wavelength of 13.5 nm is required. The EUV mask is composed of an absorber pattern and a Mo/Si multilayer on a glass substrate. This mask pattern has a three-dimensional (3D) structure. The 3D structure would modulate the EUV reflection phase, which would cause focus and pattern shifts. Thus, the review of the EUV phase image is also important. We have developed a coherent EUV scatterometry microscope (CSM), which is a simple microscope without objective optics. The EUV phase and intensity images were reconstructed with diffraction images by ptychography. For a standalone mask review, the high-harmonic-generation (HHG) EUV source was employed. In this study, we updated the sample stage, pump-laser reduction system, and gas-pressure control system to reconstruct the image. As a result, an 88 nm line-and-space pattern and a cross-line pattern were reconstructed. In addition, a particle defect of 2 µm diameter was well reconstructed. This demonstrated the high capability of the standalone CSM, which can hence be used in factories, such as mask shops and semiconductor fabrication plants.

A volume-limited survey of High Galactic latitude planetary nebulae with the Extrme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Fruscione, Antonella; Drake, Jeremy J.; Mcdonald, Kelley; Malina, Roger F.

1995-01-01

We present the results of a complete survey, at extreme-ultraviolet (EUV) wavelengths (58-234 A), of the high Galactic latitude (absolute value of b greater than or = to 20 deg) planetary nebulae (PNs) with at least one determination of the distance within 1 kpc of the Sun. The sample comprises 27 objects observed during the Extreme Ultraviolet Explorer (EUVE) all-sky survey and represents the majority of PN likely to be accessible at EUV wavelengths. Six PNs (NGC 246, NGC 1360, K1-16, LoTr 5, NGC 4361, and NGC 3587) were detected in the shortest EUV band (58-174 A). A seventh PN (NGC 6853), not included in the sample, was also detected during the survey. The emission is consistent in all cases with that of a point source and therefore most probably originates from the PN central star. Accurate EUV count rates or upper limits in the two shorter EUVE bands (centered at approximately 100 and 200 A) are given for all the sources in the sample. NGC 4361 and NGC 3587 are reported here for the first time as sources of EUV radiation. As might be expected, attenuation by the interstellar medium dominates the PN distribution in the EUV sky.

EUV polarimetry for thin film and surface characterization and EUV phase retarder reflector development.

PubMed

Gaballah, A E H; Nicolosi, P; Ahmed, Nadeem; Jimenez, K; Pettinari, G; Gerardino, A; Zuppella, P

2018-01-01

The knowledge and the manipulation of light polarization state in the vacuum ultraviolet and extreme ultraviolet (EUV) spectral regions play a crucial role from materials science analysis to optical component improvements. In this paper, we present an EUV spectroscopic ellipsometer facility for polarimetry in the 90-160 nm spectral range. A single layer aluminum mirror to be used as a quarter wave retarder has been fully characterized by deriving the optical and structural properties from the amplitude component and phase difference δ measurements. The system can be suitable to investigate the properties of thin films and optical coatings and optics in the EUV region.

``Big Bang" for NASA's Buck: Nearly Three Years of EUVE Mission Operations at UCB

NASA Astrophysics Data System (ADS)

Stroozas, B. A.; Nevitt, R.; McDonald, K. E.; Cullison, J.; Malina, R. F.

1999-12-01

After over seven years in orbit, NASA's Extreme Ultraviolet Explorer (EUVE) satellite continues to perform flawlessly and with no significant loss of science capabilities. EUVE continues to produce important and exciting science results and, with reentry not expected until 2003-2004, many more such discoveries await. In the nearly three years since the outsourcing of EUVE from NASA's Goddard Space Flight Center, the small EUVE operations team at the University of California at Berkeley (UCB) has successfully conducted all aspects of the EUVE mission -- from satellite operations, science and mission planning, and data processing, delivery, and archival, to software support, systems administration, science management, and overall mission direction. This paper discusses UCB's continued focus on automation and streamlining, in all aspects of the Project, as the means to maximize EUVE's overall scientific productivity while minimizing costs. Multitasking, non-traditional work roles, and risk management have led to expanded observing capabilities while achieving significant cost reductions and maintaining the mission's historical 99 return. This work was funded under NASA Cooperative Agreement NCC5-138.

Honing the accuracy of extreme-ultraviolet optical system testing: at-wavelength and visible-light measurements of the ETS Set-2 projection optic

NASA Astrophysics Data System (ADS)

Goldberg, Kenneth A.; Naulleau, Patrick P.; Bokor, Jeffrey; Chapman, Henry N.

2002-07-01

As the quality of optical systems for extreme ultraviolet lithography improves, high-accuracy wavefront metrology for alignment and qualification becomes ever more important. To enable the development of diffraction-limited EUV projection optics, visible-light and EUV interferometries must work in close collaboration. We present a detailed comparison of EUV and visible-light wavefront measurements performed across the field of view of a lithographic-quality EUV projection optical system designed for use in the Engineering Test Stand developed by the Virtual National Laboratory and the EUV Limited Liability Company. The comparisons reveal that the present level of RMS agreement lies in the 0.3-0.4-nm range. Astigmatism is the most significant aberration component for the alignment of this optical system; it is also the dominant term in the discrepancy, and the aberration with the highest measurement uncertainty. With EUV optical systems requiring total wavefront quality in the (lambda) EUV/50 range, and even higher surface-figure quality for the individual mirror elements, improved accuracy through future comparisons, and additional studies, are required.

Efficient extreme-UV-to-extreme-UV conversion by four-wave mixing with intense near-IR pulses in highly charged ion plasmas

NASA Astrophysics Data System (ADS)

Chu, Hsu-hsin; Wang, Jyhpyng

2018-05-01

Nonlinear optics in the extreme-ultraviolet (EUV) has been limited by lack of transparent media and small conversion efficiency. To overcome this problem we explore the advantage of using multiply charged ion plasmas as the interacting media between EUV and intense near-infrared (NIR) pulses. Such media are transparent to EUV and can withstand intense NIR driving pulses without damage. We calculate the third-order nonlinear polarizabilities of Ar2 + and Ar3 + ions for EUV and NIR four-wave mixing by using the well-proven Cowan code and find that the EUV-to-EUV conversion efficiency as high as 26% can be expected for practical experimental configurations using multi-terawatt NIR lasers. Such a high efficiency is possible because the driving pulse intensity can be scaled up to several orders of magnitude higher than in conventional nonlinear media, and the group-velocity and phase mismatch are insignificant at the experimental plasma densities. This effective scheme of wave mixing can be utilized for ultrafast EUV waveform measurement and control as well as wavelength conversion.

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

NASA Astrophysics Data System (ADS)

Putna, E. Steve; Younkin, Todd R.; Leeson, Michael; Caudillo, Roman; Bacuita, Terence; Shah, Uday; Chandhok, Manish

2011-04-01

The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 22nm half pitch node and beyond. According to recent assessments made at the 2010 EUVL Symposium, the readiness of EUV materials remains one of the top risk items for EUV adoption. The main development issue regarding EUV resists has been how to simultaneously achieve high resolution, high sensitivity, and low line width roughness (LWR). This paper describes our strategy, the current status of EUV materials, and the integrated post-development LWR reduction efforts made at Intel Corporation. Data collected utilizing Intel's Micro- Exposure Tool (MET) is presented in order to examine the feasibility of establishing a resist process that simultaneously exhibits <=22nm half-pitch (HP) L/S resolution at <=11.3mJ/cm2 with <=3nm LWR.

Mask technology for EUV lithography

NASA Astrophysics Data System (ADS)

Bujak, M.; Burkhart, Scott C.; Cerjan, Charles J.; Kearney, Patrick A.; Moore, Craig E.; Prisbrey, Shon T.; Sweeney, Donald W.; Tong, William M.; Vernon, Stephen P.; Walton, Christopher C.; Warrick, Abbie L.; Weber, Frank J.; Wedowski, Marco; Wilhelmsen, Karl C.; Bokor, Jeffrey; Jeong, Sungho; Cardinale, Gregory F.; Ray-Chaudhuri, Avijit K.; Stivers, Alan R.; Tejnil, Edita; Yan, Pei-yang; Hector, Scott D.; Nguyen, Khanh B.

1999-04-01

Extreme UV Lithography (EUVL) is one of the leading candidates for the next generation lithography, which will decrease critical feature size to below 100 nm within 5 years. EUVL uses 10-14 nm light as envisioned by the EUV Limited Liability Company, a consortium formed by Intel and supported by Motorola and AMD to perform R and D work at three national laboratories. Much work has already taken place, with the first prototypical cameras operational at 13.4 nm using low energy laser plasma EUV light sources to investigate issues including the source, camera, electro- mechanical and system issues, photoresists, and of course the masks. EUV lithograph masks are fundamentally different than conventional photolithographic masks as they are reflective instead of transmissive. EUV light at 13.4 nm is rapidly absorbed by most materials, thus all light transmission within the EUVL system from source to silicon wafer, including EUV reflected from the mask, is performed by multilayer mirrors in vacuum.

Degradation-Free Spectrometers for Solar EUV Measurements: A Progress Report

NASA Astrophysics Data System (ADS)

Wieman, S. R.; Judge, D. L.; Didkovsky, L. V.

2009-12-01

Solar EUV observations will be made using two new degradation-free EUV spectrometers on a sounding rocket flight scheduled for Summer 2010. The two instruments, a rare gas photoionization-based Optics-Free Spectrometer (OFS) and a Dual Grating Spectrometer (DGS), are filter-free and optics-free. OFS can measure the solar EUV spectrum with a spectral resolution comparable to that of grating-based EUV spectrometers. The DGS is designed to provide solar irradiance at Lyman-alpha and He II to overlap EUV observations from SOHO/SEM and SDO/EVE. Electronic and mechanical designs for the flight prototype instruments and results of tests performed with the instruments in the laboratory are reported. The spectrometers are being developed and demonstrated as part of the Degradation Free Spectrometers (DFS) project under NASA’s Low Cost Access to Space (LCAS) program and are supported by NASA Grant NNX08BA12G.

Single-expose patterning development for EUV lithography

NASA Astrophysics Data System (ADS)

De Silva, Anuja; Petrillo, Karen; Meli, Luciana; Shearer, Jeffrey C.; Beique, Genevieve; Sun, Lei; Seshadri, Indira; Oh, Taehwan; Han, Seulgi; Saulnier, Nicole; Lee, Joe; Arnold, John C.; Hamieh, Bassem; Felix, Nelson M.; Furukawa, Tsuyoshi; Singh, Lovejeet; Ayothi, Ramakrishnan

2017-03-01

Initial readiness of EUV (extreme ultraviolet) patterning was demonstrated in 2016 with IBM Alliance's 7nm device technology. The focus has now shifted to driving the 'effective' k1 factor and enabling the second generation of EUV patterning. With the substantial cost of EUV exposure there is significant interest in extending the capability to do single exposure patterning with EUV. To enable this, emphasis must be placed on the aspect ratios, adhesion, defectivity reduction, etch selectivity, and imaging control of the whole patterning process. Innovations in resist materials and processes must be included to realize the full entitlement of EUV lithography at 0.33NA. In addition, enhancements in the patterning process to enable good defectivity, lithographic process window, and post etch pattern fidelity are also required. Through this work, the fundamental material challenges in driving down the effective k1 factor will be highlighted.

Plans for the extreme ultraviolet explorer data base

NASA Technical Reports Server (NTRS)

Marshall, Herman L.; Dobson, Carl A.; Malina, Roger F.; Bowyer, Stuart

1988-01-01

The paper presents an approach for storage and fast access to data that will be obtained by the Extreme Ultraviolet Explorer (EUVE), a satellite payload scheduled for launch in 1991. The EUVE telescopes will be operated remotely from the EUVE Science Operation Center (SOC) located at the University of California, Berkeley. The EUVE science payload consists of three scanning telescope carrying out an all-sky survey in the 80-800 A spectral region and a Deep Survey/Spectrometer telescope performing a deep survey in the 80-250 A spectral region. Guest Observers will remotely access the EUVE spectrometer database at the SOC. The EUVE database will consist of about 2 X 10 to the 10th bytes of information in a very compact form, very similar to the raw telemetry data. A history file will be built concurrently giving telescope parameters, command history, attitude summaries, engineering summaries, anomalous events, and ephemeris summaries.

An Extreme-ultraviolet Wave Generating Upward Secondary Waves in a Streamer-like Solar Structure

NASA Astrophysics Data System (ADS)

Zheng, Ruisheng; Chen, Yao; Feng, Shiwei; Wang, Bing; Song, Hongqiang

2018-05-01

Extreme-ultraviolet (EUV) waves, spectacular horizontally propagating disturbances in the low solar corona, always trigger horizontal secondary waves (SWs) when they encounter the ambient coronal structure. We present the first example of upward SWs in a streamer-like structure after the passing of an EUV wave. This event occurred on 2017 June 1. The EUV wave happened during a typical solar eruption including a filament eruption, a coronal mass ejection (CME), and a C6.6 flare. The EUV wave was associated with quasi-periodic fast propagating (QFP) wave trains and a type II radio burst that represented the existence of a coronal shock. The EUV wave had a fast initial velocity of ∼1000 km s‑1, comparable to high speeds of the shock and the QFP wave trains. Intriguingly, upward SWs rose slowly (∼80 km s‑1) in the streamer-like structure after the sweeping of the EUV wave. The upward SWs seemed to originate from limb brightenings that were caused by the EUV wave. All of the results show that the EUV wave is a fast-mode magnetohydrodynamic (MHD) shock wave, likely triggered by the flare impulses. We suggest that part of the EUV wave was probably trapped in the closed magnetic fields of the streamer-like structure, and upward SWs possibly resulted from the release of slow-mode trapped waves. It is believed that the interplay of the strong compression of the coronal shock and the configuration of the streamer-like structure is crucial for the formation of upward SWs.

Extreme ultraviolet spectral irradiance measurements since 1946

NASA Astrophysics Data System (ADS)

Schmidtke, G.

2015-03-01

In the physics of the upper atmosphere the solar extreme ultraviolet (EUV) radiation plays a dominant role controlling most of the thermospheric/ionospheric (T/I) processes. Since this part of the solar spectrum is absorbed in the thermosphere, platforms to measure the EUV fluxes became only available with the development of rockets reaching altitude levels exceeding 80 km. With the availability of V2 rockets used in space research, recording of EUV spectra started in 1946 using photographic films. The development of pointing devices to accurately orient the spectrographs toward the sun initiated intense activities in solar-terrestrial research. The application of photoelectric recording technology enabled the scientists placing EUV spectrometers aboard satellites observing qualitatively strong variability of the solar EUV irradiance on short-, medium-, and long-term scales. However, as more measurements were performed more radiometric EUV data diverged due to the inherent degradation of the EUV instruments with time. Also, continuous recording of the EUV energy input to the T/I system was not achieved. It is only at the end of the last century that there was progress made in solving the serious problem of degradation enabling to monitore solar EUV fluxes with sufficient radiometric accuracy. The data sets available allow composing the data available to the first set of EUV data covering a period of 11 years for the first time. Based on the sophisticated instrumentation verified in space, future EUV measurements of the solar spectral irradiance (SSI) are promising accuracy levels of about 5% and less. With added low-cost equipment, real-time measurements will allow providing data needed in ionospheric modeling, e.g., for correcting propagation delays of navigation signals from space to earth. Adding EUV airglow and auroral emission monitoring by airglow cameras, the impact of space weather on the terrestrial T/I system can be studied with a spectral terrestrial irradiance camera (STI-Cam) and also be used investigating real-time space weather effects and deriving more detailed correction procedures for the evaluation of Global Navigation Satellite System (GNSS) signals. Progress in physics goes with achieving higher accuracy in measurements. This review historically guides the reader on the ways of exploring the impact of the variable solar radiation in the extreme ultraviolet spectral region on our upper atmosphere in the altitude regime from 80 to 1000 km.

Reconstruction and analysis of erythemal UV radiation time series from Hradec Králové (Czech Republic) over the past 50 years

NASA Astrophysics Data System (ADS)

Čížková, Klára; Láska, Kamil; Metelka, Ladislav; Staněk, Martin

2018-02-01

This paper evaluates the variability of erythemal ultraviolet (EUV) radiation from Hradec Králové (Czech Republic) in the period 1964-2013. The EUV radiation time series was reconstructed using a radiative transfer model and additional empirical relationships, with the final root mean square error of 9.9 %. The reconstructed time series documented the increase in EUV radiation doses in the 1980s and the 1990s (up to 15 % per decade), which was linked to the steep decline in total ozone (10 % per decade). The changes in cloud cover were the major factor affecting the EUV radiation doses especially in the 1960s, 1970s, and at the beginning of the new millennium. The mean annual EUV radiation doses in the decade 2004-2013 declined by 5 %. The factors affecting the EUV radiation doses differed also according to the chosen integration period (daily, monthly, and annually): solar zenith angle was the most important for daily doses, cloud cover, and surface UV albedo for their monthly means, and the annual means of EUV radiation doses were most influenced by total ozone column. The number of days with very high EUV radiation doses increased by 22 % per decade, the increase was statistically significant in all seasons except autumn. The occurrence of the days with very high EUV doses was influenced mostly by low total ozone column (82 % of days), clear-sky or partly cloudy conditions (74 % of days) and by increased surface albedo (19 % of days). The principal component analysis documented that the occurrence of days with very high EUV radiation doses was much affected by the positive phase of North Atlantic Oscillation with an Azores High promontory reaching over central Europe. In the stratosphere, a strong Arctic circumpolar vortex and the meridional inflow of ozone-poor air from the southwest were favorable for the occurrence of days with very high EUV radiation doses. This is the first analysis of the relationship between the high EUV radiation doses and macroscale circulation patterns, and therefore more attention should be given also to other dynamical variables that may affect the solar UV radiation on the Earth surface.

Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling

NASA Astrophysics Data System (ADS)

Fomenkov, Igor; Brandt, David; Ershov, Alex; Schafgans, Alexander; Tao, Yezheng; Vaschenko, Georgiy; Rokitski, Slava; Kats, Michael; Vargas, Michael; Purvis, Michael; Rafac, Rob; La Fontaine, Bruno; De Dea, Silvia; LaForge, Andrew; Stewart, Jayson; Chang, Steven; Graham, Matthew; Riggs, Daniel; Taylor, Ted; Abraham, Mathew; Brown, Daniel

2017-06-01

Extreme ultraviolet (EUV) lithography is expected to succeed in 193-nm immersion multi-patterning technology for sub-10-nm critical layer patterning. In order to be successful, EUV lithography has to demonstrate that it can satisfy the industry requirements in the following critical areas: power, dose stability, etendue, spectral content, and lifetime. Currently, development of second-generation laser-produced plasma (LPP) light sources for the ASML's NXE:3300B EUV scanner is complete, and first units are installed and operational at chipmaker customers. We describe different aspects and performance characteristics of the sources, dose stability results, power scaling, and availability data for EUV sources and also report new development results.

Ultra-broadband ptychography with self-consistent coherence estimation from a high harmonic source

NASA Astrophysics Data System (ADS)

Odstrčil, M.; Baksh, P.; Kim, H.; Boden, S. A.; Brocklesby, W. S.; Frey, J. G.

2015-09-01

With the aim of improving imaging using table-top extreme ultraviolet sources, we demonstrate coherent diffraction imaging (CDI) with relative bandwidth of 20%. The coherence properties of the illumination probe are identified using the same imaging setup. The presented methods allows for the use of fewer monochromating optics, obtaining higher flux at the sample and thus reach higher resolution or shorter exposure time. This is important in the case of ptychography when a large number of diffraction patterns need to be collected. Our microscopy setup was tested on a reconstruction of an extended sample to show the quality of the reconstruction. We show that high harmonic generation based EUV tabletop microscope can provide reconstruction of samples with a large field of view and high resolution without additional prior knowledge about the sample or illumination.

Coordinated XTE/EUVE Observations of Algol

NASA Technical Reports Server (NTRS)

Stern, Robert A.

1997-01-01

EUVE, ASCA, and XTE observed the eclipsing binary Algol (Beta Per) from 1-7 Feb. 96. The coordinated observation covered approximately 2 binary orbits of the system, with a net exposure of approximately 160 ksec for EUVE, 40 ksec for ASCA (in 4 pointing), and 90 ksec for XTE (in 45 pointings). We discuss results of modeling the combined EUVE, ASCA, and XTE data using continuous differential emission measure distributions, and provide constraints on the Fe abundance in the Algol system.

Seasonal variability of Martian ion escape through the plume and tail from MAVEN observations

NASA Astrophysics Data System (ADS)

Dong, Y.; Fang, X.; Brain, D. A.; McFadden, J. P.; Halekas, J. S.; Connerney, J. E. P.; Eparvier, F.; Andersson, L.; Mitchell, D.; Jakosky, B. M.

2017-04-01

We study the Mars Atmosphere and Volatile Evolution spacecraft observations of Martian planetary ion escape during two time periods: 11 November 2014 to 19 March 2015 and 4 June 2015 to 24 October 2015, with the focus on understanding the seasonal variability of Martian ion escape in response to the solar extreme ultraviolet (EUV) flux. We organize the >6 eV O+ ion data by the upstream electric field direction to estimate the escape rates through the plume and tail. To investigate the ion escape dependence on the solar EUV flux, we constrain the solar wind dynamic pressure and interplanetary magnetic filed strength and compare the ion escape rates through the plume and tail in different energy ranges under high and low EUV conditions. We found that the total >6 eV O+ escape rate increases from 2 to 3 × 1024 s-1 as the EUV irradiance increases by almost the same factor, mostly on the <1 keV tailward escape. The plume escape rate does not vary significantly with EUV. The relative contribution from the plume to the total escape varies between 30% and 20% from low to high EUV. Our results suggest that the Martian ion escape is sensitive to the seasonal EUV variation, and the contribution from plume escape becomes more important under low EUV conditions.

Update on EUV radiometry at PTB

NASA Astrophysics Data System (ADS)

Laubis, Christian; Barboutis, Annett; Buchholz, Christian; Fischer, Andreas; Haase, Anton; Knorr, Florian; Mentzel, Heiko; Puls, Jana; Schönstedt, Anja; Sintschuk, Michael; Soltwisch, Victor; Stadelhoff, Christian; Scholze, Frank

2016-03-01

The development of technology infrastructure for EUV Lithography (EUVL) still requires higher levels of technology readiness in many fields. A large number of new materials will need to be introduced. For example, development of EUV compatible pellicles to adopt an approved method from optical lithography for EUVL needs completely new thin membranes which have not been available before. To support these developments, PTB with its decades of experience [1] in EUV metrology [2] provides a wide range of actinic and non actinic measurements at in-band EUV wavelengths as well as out of band. Two dedicated, complimentary EUV beamlines [3] are available for radiometric [4,5] characterizations benefiting from small divergence or from adjustable spot size respectively. The wavelength range covered reaches from below 1 nm to 45 nm [6] for the EUV beamlines [7] to longer wavelengths if in addition the VUV beamline is employed. The standard spot size is 1 mm by 1 mm with an option to go as low as 0.1 mm to 0.1 mm. A separate beamline offers an exposure setup. Exposure power levels of 20 W/cm2 have been employed in the past, lower fluencies are available by attenuation or out of focus exposure. Owing to a differential pumping stage, the sample can be held under defined gas conditions during exposure. We present an updated overview on our instrumentation and analysis capabilities for EUV metrology and provide data for illustration.

Classification and printability of EUV mask defects from SEM images

NASA Astrophysics Data System (ADS)

Cho, Wonil; Price, Daniel; Morgan, Paul A.; Rost, Daniel; Satake, Masaki; Tolani, Vikram L.

2017-10-01

Classification and Printability of EUV Mask Defects from SEM images EUV lithography is starting to show more promise for patterning some critical layers at 5nm technology node and beyond. However, there still are many key technical obstacles to overcome before bringing EUV Lithography into high volume manufacturing (HVM). One of the greatest obstacles is manufacturing defect-free masks. For pattern defect inspections in the mask-shop, cutting-edge 193nm optical inspection tools have been used so far due to lacking any e-beam mask inspection (EBMI) or EUV actinic pattern inspection (API) tools. The main issue with current 193nm inspection tools is the limited resolution for mask dimensions targeted for EUV patterning. The theoretical resolution limit for 193nm mask inspection tools is about 60nm HP on masks, which means that main feature sizes on EUV masks will be well beyond the practical resolution of 193nm inspection tools. Nevertheless, 193nm inspection tools with various illumination conditions that maximize defect sensitivity and/or main-pattern modulation are being explored for initial EUV defect detection. Due to the generally low signal-to-noise in the 193nm inspection imaging at EUV patterning dimensions, these inspections often result in hundreds and thousands of defects which then need to be accurately reviewed and dispositioned. Manually reviewing each defect is difficult due to poor resolution. In addition, the lack of a reliable aerial dispositioning system makes it very challenging to disposition for printability. In this paper, we present the use of SEM images of EUV masks for higher resolution review and disposition of defects. In this approach, most of the defects detected by the 193nm inspection tools are first imaged on a mask SEM tool. These images together with the corresponding post-OPC design clips are provided to KLA-Tencor's Reticle Decision Center (RDC) platform which provides ADC (Automated Defect Classification) and S2A (SEM-to-Aerial printability) analysis of every defect. First, a defect-free or reference mask SEM is rendered from the post-OPC design, and the defective signature is detected from the defect-reference difference image. These signatures help assess the true nature of the defect as evident in e-beam imaging; for example, excess or missing absorber, line-edge roughness, contamination, etc. Next, defect and reference contours are extracted from the grayscale SEM images and fed into the simulation engine with an EUV scanner model to generate corresponding EUV defect and reference aerial images. These are then analyzed for printability and dispositioned using an Aerial Image Analyzer (AIA) application to automatically measure and determine the amount of CD errors. Thus by integrating EUV ADC and S2A applications together, every defect detection is characterized for its type and printability which is essential for not only determining which defects to repair, but also in monitoring the performance of EUV mask process tools. The accuracy of the S2A print modeling has been verified with other commercially-available simulators, and will also be verified with actual wafer print results. With EUV lithography progressing towards volume manufacturing at 5nm technology, and the likelihood of EBMI inspectors approaching the horizon, the EUV ADC-S2A system will continue serving an essential role of dispositioning defects off e-beam imaging.

EUV Spectroscopy of High-redshift X-ray Objects

NASA Astrophysics Data System (ADS)

Kowalski, Michael Paul; Wolff, M. T.; Wood, K. S.; Barbee, T. W., Jr.

2010-03-01

As astronomical observations are pushed to cosmological distances (z>3) the spectral energy distributions of X-ray objects, AGNs for example, will have their maxima redshifted into the EUV waveband ( 90-912 Å/0.1-0.01 keV). Consequently, a wealth of spectral diagnostics, provided by, for example, the Fe L-shell complex ( 60-6 Å/0.2-2.0 keV) and the O VII/VIII lines ( 20 Å/0.5 keV), will be lost to X-ray instruments operating at traditional ( 0.5-10 keV) and higher X-ray energies. There are precedents in other wavebands. For example, HST evolutionary studies will become largely the province of JWST. Despite the successes of EUVE, the ROSAT WFC, and the Chandra LETG, the EUV continues to be unappreciated and under-utilized, partly because of a preconception that absorption by neutral galactic Hydrogen in the ISM prevents any useful extragalactic measurements at all EUV wavelengths and, until recently, by a lack of a suitable enabling technology. Thus, if future planned X-ray missions (e.g., IXO, Gen-X) are optimized again for traditional X-ray energies, their performance (effective area, resolving power) will be cut off at ultrasoft X-ray energies or at best be radically reduced in the EUV. This opens up a critical gap in performance located right at short EUV wavelengths, where the critical X-ray spectral transitions occur in high-z objects. However, normal-incidence multilayer-grating technology, which performs best precisely at such wavelengths, together with advanced nano-laminate fabrication techniques have been developed and are now mature to the point where advanced EUV instrument designs with performance complementary to IXO and Gen-X are practical. Such EUV instruments could be flown either independently or as secondary instruments on these X-ray missions. We present here a critical examination of the limits placed on extragalactic EUV measurements by ISM absorption, the range where high-z measurements are practical, and the requirements this imposes on next-generation instrument designs.

Extreme Ultraviolet Variability Experiment (EVE) on the Solar Dynamics Observatory (SDO): Overview of Science Objectives, Instrument Design, Data Products, and Model Developments

NASA Technical Reports Server (NTRS)

Woods, T. N.; Eparvier, F. G.; Hock, R.; Jones, A. R.; Woodraska, D.; Judge, D.; Didkovsky, L.; Lean, J.; Mariska, J.; Warren, H.;

EUV Waves Driven by the Sudden Expansion of Transequatorial Loops Caused by Coronal Jets

NASA Astrophysics Data System (ADS)

Shen, Yuandeng; Tang, Zehao; Miao, Yuhu; Su, Jiangtao; Liu, Yu

2018-06-01

We present two events to study the driving mechanism of extreme-ultraviolet (EUV) waves that are not associated with coronal mass ejections (CMEs), by using high-resolution observations taken by the Atmospheric Imaging Assembly on board the Solar Dynamics Observatory. Observational results indicate that the observed EUV waves were accompanied by flares and coronal jets, but not the CMEs that were regarded as drivers of most EUV waves in previous studies. In the first case, it is observed that a coronal jet is ejected along a transequatorial loop system at a plane-of-the-sky (POS) speed of 335 ± 22 km s{}-1; in the meantime, an arc-shaped EUV wave appeared on the eastern side of the loop system. In addition, the EUV wave further interacted with another interconnecting loop system and launched a fast propagating (QFP) magnetosonic wave along the loop system, which had a period of 200 s and a speed of 388 ± 65 km s{}-1, respectively. In the second case, we observed a coronal jet that ejected at a POS speed of 282 ± 44 km s{}-1 along a transequatorial loop system as well as the generation of bright EUV waves on the eastern side of the loop system. Based on the observational results, we propose that the observed EUV waves on the eastern side of the transequatorial loop systems are fast-mode magnetosonic waves and that they are driven by the sudden lateral expansion of the transequatorial loop systems due to the direct impingement of the associated coronal jets, while the QFP wave in the fist case formed due to the dispersive evolution of the disturbance caused by the interaction between the EUV wave and the interconnecting coronal loops. It is noted that EUV waves driven by sudden loop expansions have shorter lifetimes than those driven by CMEs.

Maskless EUV lithography: an already difficult technology made even more complicated?

NASA Astrophysics Data System (ADS)

Chen, Yijian

2012-03-01

In this paper, we present the research progress made in maskless EUV lithography and discuss the emerging opportunities for this disruptive technology. It will be shown nanomirrors based maskless approach is one path to costeffective and defect-free EUV lithography, rather than making it even more complicated. The focus of our work is to optimize the existing vertical comb process and scale down the mirror size from several microns to sub-micron regime. The nanomirror device scaling, system configuration, and design issues will be addressed. We also report our theoretical and simulation study of reflective EUV nanomirror based imaging behavior. Dense line/space patterns are formed with an EUV nanomirror array by assigning a phase shift of π to neighboring nanomirrors. Our simulation results show that phase/intensity imbalance is an inherent characteristic of maskless EUV lithography while it only poses a manageable challenge to CD control and process window. The wafer scan and EUV laser jitter induced image blur phenomenon is discussed and a blurred imaging theory is constructed. This blur effect is found to degrade the image contrast at a level that mainly depends on the wafer scan speed.

High reflectance coatings for space applications in the EUV

NASA Technical Reports Server (NTRS)

Keski-Kuha, Ritva A. M.; Gum, Jeffrey S.; Osantowski, John F.; Fleetwood, Charles M.

1993-01-01

Advances in optical coating and materials technology have made possible the development of instruments with substantially improved efficiency and made possible to consider more complex optical designs in the EUV. The importance of recent developments in chemical vapor deposited silicon carbide (CVD-SiC), SiC films and multilayer coatings is discussed in the context of EUV instrumentation design. The EUV performance of these coatings as well as some strengths and problem areas for their use in space will be addressed.

Modeling 13.3nm Fe XXIII Flare Emissions Using the GOES-R EXIS Instrument

NASA Astrophysics Data System (ADS)

Rook, H.; Thiemann, E.

2017-12-01

The solar EUV spectrum is dominated by atomic transitions in ionized atoms in the solar atmosphere. As solar flares evolve, plasma temperatures and densities change, influencing abundances of various ions, changing intensities of different EUV wavelengths observed from the sun. Quantifying solar flare spectral irradiance is important for constraining models of Earth's atmosphere, improving communications quality, and controlling satellite navigation. However, high time cadence measurements of flare irradiance across the entire EUV spectrum were not available prior to the launch of SDO. The EVE MEGS-A instrument aboard SDO collected 0.1nm EUV spectrum data from 2010 until 2014, when the instrument failed. No current or future instrument is capable of similar high resolution and time cadence EUV observation. This necessitates a full EUV spectrum model to study EUV phenomena at Earth. It has been recently demonstrated that one hot flare EUV line, such as the 13.3nm Fe XXIII line, can be used to model cooler flare EUV line emissions, filling the role of MEGS-A. Since unblended measurements of Fe XXIII are typically unavailable, a proxy for the Fe XXIII line must be found. In this study, we construct two models of this line, first using the GOES 0.1-0.8nm soft x-ray (SXR) channel as the Fe XXIII proxy, and second using a physics-based model dependent on GOES emission measure and temperature data. We determine that the more sophisticated physics-based model shows better agreement with Fe XXIII measurements, although the simple proxy model also performs well. We also conclude that the high correlation between Fe XXIII emissions and the GOES 0.1-0.8nm band is because both emissions tend to peak near the GOES emission measure peak despite large differences in their contribution functions.

ILT optimization of EUV masks for sub-7nm lithography

NASA Astrophysics Data System (ADS)

Hooker, Kevin; Kuechler, Bernd; Kazarian, Aram; Xiao, Guangming; Lucas, Kevin

2017-06-01

The 5nm and 7nm technology nodes will continue recent scaling trends and will deliver significantly smaller minimum features, standard cell areas and SRAM cell areas vs. the 10nm node. There are tremendous economic pressures to shrink each subsequent technology, though in a cost-effective and performance enhancing manner. IC manufacturers are eagerly awaiting EUV so that they can more aggressively shrink their technology than they could by using complicated MPT. The current 0.33NA EUV tools and processes also have their patterning limitations. EUV scanner lenses, scanner sources, masks and resists are all relatively immature compared to the current lithography manufacturing baseline of 193i. For example, lens aberrations are currently several times larger (as a function of wavelength) in EUV scanners than for 193i scanners. Robustly patterning 16nm L/S fully random logic metal patterns and 40nm pitch random logic rectangular contacts with 0.33NA EUV are tough challenges that will benefit from advanced OPC/RET. For example, if an IC manufacturer can push single exposure device layer resolution 10% tighter using improved ILT to avoid using DPT, there will be a significant cost and process complexity benefit to doing so. ILT is well known to have considerable benefits in finding flexible 193i mask pattern solutions to improve process window, improve 2D CD control, improve resolution in low K1 lithography regime and help to delay the introduction of DPT. However, ILT has not previously been applied to EUV lithography. In this paper, we report on new developments which extend ILT method to EUV lithography and we characterize the benefits seen vs. traditional EUV OPC/RET methods.

Design requirements for a stand alone EUV interferometer

NASA Astrophysics Data System (ADS)

Michallon, Ph.; Constancias, C.; Lagrange, A.; Dalzotto, B.

2008-03-01

EUV lithography is expected to be inserted for the 32/22 nm nodes with possible extension below. EUV resist availability remains one of the main issues to be resolved. There is an urgent need to provide suitable tools to accelerate resist development and to achieve resolution, LER and sensitivity specifications simultaneously. An interferometer lithography tool offers advantages regarding conventional EUV exposure tool. It allows the evaluation of resists, free from the deficiencies of optics and mask which are limiting the achieved resolution. Traditionally, a dedicated beam line from a synchrotron, with limited access, is used as a light source in EUV interference lithography. This paper identifies the technology locks to develop a stand alone EUV interferometer using a compact EUV source. It will describe the theoretical solutions adopted and especially look at the feasibility according to available technologies. EUV sources available on the market have been evaluated in terms of power level, source size, spatial coherency, dose uniformity, accuracy, stability and reproducibility. According to the EUV source characteristics, several optic designs were studied (simple or double gratings). For each of these solutions, the source and collimation optic specifications have been determined. To reduce the exposure time, a new grating technology will also be presented allowing to significantly increasing the transmission system efficiency. The optical grating designs were studied to allow multi-pitch resolution print on the same exposure without any focus adjustment. Finally micro mechanical system supporting the gratings was studied integrating the issues due to vacuum environment, alignment capability, motion precision, automation and metrology to ensure the needed placement control between gratings and wafer. A similar study was carried out for the collimation-optics mechanical support which depends on the source characteristics.

Actinic defect counting statistics over 1-cm2 area of EUVL mask blank

NASA Astrophysics Data System (ADS)

Jeong, Seongtae; Lai, Chih-wei; Rekawa, Senajith; Walton, Christopher C.; Bokor, Jeffrey

2000-07-01

As a continuation of comparison experiments between EUV inspection and visible inspection of defects on EUVL mask blanks, we report on the result of an experiment where the EUV defect inspection tool is used to perform at-wavelength defect counting over 1 cm2 of EUVL mask blank. Initial EUV inspection found five defects over the scanned area and the subsequent optical scattering inspection was able to detect all of the five defects. Therefore, if there are any defects that are only detectable by EUV inspection, the density is lower than the order of unity per cm2. An upgrade path to substantially increase the overall throughput of the EUV inspection system is also identified in the manuscript.

The Extreme Ultraviolet Flux of Very Low Mass Stars

NASA Astrophysics Data System (ADS)

Drake, Jeremy

2017-09-01

The X-ray and EUV emission of stars is vital for understanding the atmospheres and evolution of their planets. The coronae of dwarf stars later than M6 behave differently to those of earlier spectral types and are more X-ray dim and radio bright. Too faint to have been observed by EUVE, their EUV behavior is currently highly uncertain. We propose to observe a small sample of late M dwarfs using the off-axis HRC-S thin Al" filter that is sensitive to EUV emission in the 50-200 A range. The measured fluxes will be used to understand the amount of cooler coronal plasma present, and extend X-ray-EUV flux relations to the latest stellar types.

Biotransformation of anthelmintics and the activity of drug-metabolizing enzymes in the tapeworm Moniezia expansa.

PubMed

Prchal, Lukáš; Bártíková, Hana; Bečanová, Aneta; Jirásko, Robert; Vokřál, Ivan; Stuchlíková, Lucie; Skálová, Lenka; Kubíček, Vladimír; Lamka, Jiří; Trejtnar, František; Szotáková, Barbora

2015-04-01

The sheep tapeworm Moniezia expansa is very common parasite, which affects ruminants such as sheep, goats as well as other species. The benzimidazole anthelmintics albendazole (ABZ), flubendazole (FLU) and mebendazole (MBZ) are often used to treat the infection. The drug-metabolizing enzymes of helminths may alter the potency of anthelmintic treatment. The aim of our study was to assess the activity of the main drug-metabolizing enzymes and evaluate the metabolism of selected anthelmintics (ABZ, MBZ and FLU) in M. expansa. Activities of biotransformation enzymes were determined in subcellular fractions. Metabolites of the anthelmintics were detected and identified using high performance liquid chromatography/ultra-violet/VIS/fluorescence or ultra-high performance liquid chromatography/mass spectrometry. Reduction of MBZ, FLU and oxidation of ABZ were proved as well as activities of various metabolizing enzymes. Despite the fact that the conjugation enzymes glutathione S-transferase, UDP-glucuronosyl transferase and UDP-glucosyl transferase were active in vitro, no conjugated metabolites of anthelmintics were identified either ex vivo or in vitro. The obtained results indicate that sheep tapeworm is able to deactivate the administered anthelmintics, and thus protects itself against their action.

Study on photochemical analysis system (VLES) for EUV lithography

NASA Astrophysics Data System (ADS)

Sekiguchi, A.; Kono, Y.; Kadoi, M.; Minami, Y.; Kozawa, T.; Tagawa, S.; Gustafson, D.; Blackborow, P.

2007-03-01

A system for photo-chemical analysis of EUV lithography processes has been developed. This system has consists of 3 units: (1) an exposure that uses the Z-Pinch (Energetiq Tech.) EUV Light source (DPP) to carry out a flood exposure, (2) a measurement system RDA (Litho Tech Japan) for the development rate of photo-resists, and (3) a simulation unit that utilizes PROLITH (KLA-Tencor) to calculate the resist profiles and process latitude using the measured development rate data. With this system, preliminary evaluation of the performance of EUV lithography can be performed without any lithography tool (Stepper and Scanner system) that is capable of imaging and alignment. Profiles for 32 nm line and space pattern are simulated for the EUV resist (Posi-2 resist by TOK) by using VLES that hat has sensitivity at the 13.5nm wavelength. The simulation successfully predicts the resist behavior. Thus it is confirmed that the system enables efficient evaluation of the performance of EUV lithography processes.

Estimation of resist sensitivity for extreme ultraviolet lithography using an electron beam

DOE Office of Scientific and Technical Information (OSTI.GOV)

Oyama, Tomoko Gowa, E-mail: ohyama.tomoko@qst.go.jp; Oshima, Akihiro; Tagawa, Seiichi, E-mail: tagawa@sanken.osaka-u.ac.jp

2016-08-15

It is a challenge to obtain sufficient extreme ultraviolet (EUV) exposure time for fundamental research on developing a new class of high sensitivity resists for extreme ultraviolet lithography (EUVL) because there are few EUV exposure tools that are very expensive. In this paper, we introduce an easy method for predicting EUV resist sensitivity by using conventional electron beam (EB) sources. If the chemical reactions induced by two ionizing sources (EB and EUV) are the same, the required absorbed energies corresponding to each required exposure dose (sensitivity) for the EB and EUV would be almost equivalent. Based on this theory, wemore » calculated the resist sensitivities for the EUV/soft X-ray region. The estimated sensitivities were found to be comparable to the experimentally obtained sensitivities. It was concluded that EB is a very useful exposure tool that accelerates the development of new resists and sensitivity enhancement processes for 13.5 nm EUVL and 6.x nm beyond-EUVL (BEUVL).« less

AWARE - The Automated EUV Wave Analysis and REduction algorithm

NASA Astrophysics Data System (ADS)

Ireland, J.; Inglis; A. R.; Shih, A. Y.; Christe, S.; Mumford, S.; Hayes, L. A.; Thompson, B. J.

2016-10-01

Extreme ultraviolet (EUV) waves are large-scale propagating disturbances observed in the solar corona, frequently associated with coronal mass ejections and flares. Since their discovery over two hundred papers discussing their properties, causes and physics have been published. However, their fundamental nature and the physics of their interactions with other solar phenomena are still not understood. To further the understanding of EUV waves, and their relation to other solar phenomena, we have constructed the Automated Wave Analysis and REduction (AWARE) algorithm for the detection of EUV waves over the full Sun. The AWARE algorithm is based on a novel image processing approach to isolating the bright wavefront of the EUV as it propagates across the corona. AWARE detects the presence of a wavefront, and measures the distance, velocity and acceleration of that wavefront across the Sun. Results from AWARE are compared to results from other algorithms for some well known EUV wave events. Suggestions are also give for further refinements to the basic algorithm presented here.

New Mobile Lidar Systems Aboard Ultra-Light Aircrafts

NASA Astrophysics Data System (ADS)

Chazette, Patrick; Shang, Xiaoxia; Totems, Julien; Marnas, Fabien; Sanak, Joseph

2013-04-01

Two lidar systems embedded on ultra light aircraft (ULA) flew over the Rhone valley, south-east of France, to characterize the vertical extend of pollution aerosols in this area influenced by large industrial sites. The main industrial source is the Etang de Berre (43°28' N, 5°01' E), close to Marseille city. The emissions are mainly due to metallurgy and petrochemical factories. Traffic related to Marseille's area contribute to pollution with its ~1500000 inhabitants. Note that the maritime traffic close to Marseille may play an important role due to its position as the leading French harbor . For the previous scientific purpose and for the first time on ULA, we flew a mini-N2 Raman lidar system to help the assessment of the aerosol optical properties. Another Ultra-Violet Rayleigh-Mie lidar has been integrated aboard a second ULA. The lidars are compact and eye safe instruments. They operate at the wavelength of 355 nm with a sampling along the line-of-sight of 0.75 m. Different flights plans were tested to use the two lidars in synergy. We will present the different approaches and discuss both their advantages and limitations. Acknowledgements: the lidar systems have been developed by CEA. They have been deployed with the support of FERRING France. We acknowledge the ULA pilots Franck Toussaint, François Bernard and José Coutet, and the Air Creation ULA Company for logistical help during the ULA campaign.

Fine figure correction and other applications using novel MRF fluid designed for ultra-low roughness

NASA Astrophysics Data System (ADS)

Maloney, Chris; Oswald, Eric S.; Dumas, Paul

2015-10-01

An increasing number of technologies require ultra-low roughness (ULR) surfaces. Magnetorheological Finishing (MRF) is one of the options for meeting the roughness specifications for high-energy laser, EUV and X-ray applications. A novel MRF fluid, called C30, has been developed to finish surfaces to ULR. This novel MRF fluid is able to achieve <1.5Å RMS roughness on fused silica and other materials, but has a lower material removal rate with respect to other MRF fluids. As a result of these properties, C30 can also be used for applications in addition to finishing ULR surfaces. These applications include fine figure correction, figure correcting extremely soft materials and removing cosmetic defects. The effectiveness of these new applications is explored through experimental data. The low removal rate of C30 gives MRF the capability to fine figure correct low amplitude errors that are usually difficult to correct with higher removal rate fluids. The ability to figure correct extremely soft materials opens up MRF to a new realm of materials that are difficult to polish. C30 also offers the ability to remove cosmetic defects that often lead to failure during visual quality inspections. These new applications for C30 expand the niche in which MRF is typically used for.

Ionospheric Change and Solar EUV Irradiance

NASA Astrophysics Data System (ADS)

Sojka, J. J.; David, M.; Jensen, J. B.; Schunk, R. W.

2011-12-01

The ionosphere has been quantitatively monitored for the past six solar cycles. The past few years of observations are showing trends that differ from the prior cycles! Our good statistical relationships between the solar radio flux index at 10.7 cm, the solar EUV Irradiance, and the ionospheric F-layer peak density are showing indications of divergence! Present day discussion of the Sun-Earth entering a Dalton Minimum would suggest change is occurring in the Sun, as the driver, followed by the Earth, as the receptor. The dayside ionosphere is driven by the solar EUV Irradiance. But different components of this spectrum affect the ionospheric layers differently. For a first time the continuous high cadence EUV spectra from the SDO EVE instrument enable ionospheric scientists the opportunity to evaluate solar EUV variability as a driver of ionospheric variability. A definitive understanding of which spectral components are responsible for the E- and F-layers of the ionosphere will enable assessments of how over 50 years of ionospheric observations, the solar EUV Irradiance has changed. If indeed the evidence suggesting the Sun-Earth system is entering a Dalton Minimum periods is correct, then the comprehensive EVE solar EUV Irradiance data base combined with the ongoing ionospheric data bases will provide a most fortuitous fiduciary reference baseline for Sun-Earth dependencies. Using the EVE EUV Irradiances, a physics based ionospheric model (TDIM), and 50 plus years of ionospheric observation from Wallops Island (Virginia) the above Sun-Earth ionospheric relationship will be reported on.

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yadav, P. K., E-mail: praveenyadav@rrcat.gov.in; Swami, M. K.

Characterization of synchrotron induced contamination on optical elements and their cleaning are serious issues in beam lines. We used Raman spectroscopy for characterization of synchrotron induced contamination layer on LiF window (used in high resolution vacuum ultra violet beam line). Three peaks at 1035 cm{sup −1} (corresponding to C-C sp{sup 3} vibrations), 1563 cm{sup −1} and 1375 cm{sup −1} (corresponding to G and D bands of carbon) are observed. By data fitting I(D)/I(G) ratio (0.84) and FWHM(G)=124 cm{sup −1} was obtained. Comparison with available literature indicates that the carbon might be present in the form of rings of hydrogenated amorphousmore » carbon a-C:H (GLHC) with atomic hydrogen concentration about 15% with both sp{sup 2} and sp{sup 3} hybridization.« less

Degradation Analysis of NBR and Epichlorohydrin Rubber by New Micro Analysis Method

NASA Astrophysics Data System (ADS)

Katoh, Hisao; Kamoto, Ritsu; Murata, Jun

The degradation analysis of NBR and Epichlorohydrin rubber was carried out by infrared micro spectroscopy (μ-IR) and micro sampling mass spectrometry (μ-MS) which gives information on the scission and crosslinking of rubber molecules. Samples were prepared by three different treatments, heat as well as ultra violet (UV) and electron beam (EB) irradiations. It was found for NBR vulcanizates that the heat treatment induced the oxidation, scission and crosslinking of rubber molecules. By the UV treatment, chain scission and crosslinking accompanied by a slight oxidation were induced. The EB treatment enhanced the crosslinking, however, the extent of oxidation was negligible. For Epichlorohydrin rubber vulcanizates, the heat treatment accelerated chain scission rather than crosslinking. On the other hand, the oxidation and crosslinking were induced by the UV and EB treatments.

Characterization of SiPM for cryogenic applications

NASA Astrophysics Data System (ADS)

Cervi, T.; Bonesini, M.; Falcone, A.; Menegolli, A.; Raselli, G. L.; Rossella, M.; Simonetta, M.; Torti, M.

2016-07-01

The development of detectors based on liquefied noble gas (LAr, LXe) is mandatory for experiments dedicated to study physics beyond the Standard Model. For this purpose, it is fundamental to detect the Vacuum Ultra Violet (VUV) scintillation light, produced after the passage of ionizing particles inside the detector sensitive volume, to be used for trigger, timing and calorimetric purposes. Besides the traditional cryogenic Photo-Multiplier Tubes (PMTs), one possibility is to adopt Silicon Photo-Multipliers (SiPMs). We present a comparison of the performance of a SiPM (mod. ASD-NUV3S-P Low Afterpulse) at various cryogenic temperatures, from 60 K up to room temperature, with particular emphasis on the LAr and LXe temperatures. SiPM were characterized in terms of breakdown voltage, gain, pulse shape response, dark count rate and correlated noise.

Velocity-gauge real-time TDDFT within a numerical atomic orbital basis set

DOE PAGES

Pemmaraju, C. D.; Vila, F. D.; Kas, J. J.; ...

2018-02-07

The interaction of laser fields with solid-state systems can be modeled efficiently within the velocity-gauge formalism of real-time time dependent density functional theory (RT-TDDFT). In this article, we discuss the implementation of the velocity-gauge RT-TDDFT equations for electron dynamics within a linear combination of atomic orbitals (LCAO) basis set framework. Numerical results obtained from our LCAO implementation, for the electronic response of periodic systems to both weak and intense laser fields, are compared to those obtained from established real-space grid and Full-Potential Linearized Augmented Planewave approaches. As a result, potential applications of the LCAO based scheme in the context ofmore » extreme ultra-violet and soft X-ray spectroscopies involving core-electronic excitations are discussed.« less

Synchrotron radiation-induced contamination on LiF window: Characterization by Raman spectroscopy

NASA Astrophysics Data System (ADS)

Yadav, P. K.; Swami, M. K.

2016-05-01

Characterization of synchrotron induced contamination on optical elements and their cleaning are serious issues in beam lines. We used Raman spectroscopy for characterization of synchrotron induced contamination layer on LiF window (used in high resolution vacuum ultra violet beam line). Three peaks at 1035 cm-1 (corresponding to C-C sp3 vibrations), 1563 cm-1 and 1375 cm-1 (corresponding to G and D bands of carbon) are observed. By data fitting I(D)/I(G) ratio (0.84) and FWHM(G)=124 cm-1 was obtained. Comparison with available literature indicates that the carbon might be present in the form of rings of hydrogenated amorphous carbon a-C:H (GLHC) with atomic hydrogen concentration about 15% with both sp2 and sp3 hybridization.

Spent fuel burnup estimation by Cerenkov glow intensity measurement

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kuribara, Masayuki

1994-10-01

The Cerenkov glow images from irradiated fuel assemblies of boiling-water reactors (BWR) and pressurized-water reactors (PWR) are generally used for inspections. For this purpose, a new UV-I.I. CVD (ultra-violet light image intensifier Cerenkov viewing device), has been developed. This new device can measure the intensity of the Cerenkov glow from a spent fuel assembly, thus making it possible to estimate the burnup of the fuel assembly by comparing the Cerenkov glow intensity to the reference intensity. The experiment was carried out on BWR spent fuel assemblies and the results show that burnups are estimated within 20% accuracy compared to themore » declared burnups for the tested spent fuel assemblies for cooling times ranging from 900--2.000 d.« less

Optical properties of a-plane (Al, Ga)N/GaN multiple quantum wells grown on strain engineered Zn1-xMgxO layers by molecular beam epitaxy

NASA Astrophysics Data System (ADS)

Xia, Y.; Brault, J.; Nemoz, M.; Teisseire, M.; Vinter, B.; Leroux, M.; Chauveau, J.-M.

2011-12-01

Nonpolar (112¯0) Al0.2Ga0.8N/GaN multiple quantum wells (MQWs) have been grown by molecular beam epitaxy on (112¯0) Zn0.74Mg0.26O templates on r-plane sapphire substrates. The quantum wells exhibit well-resolved photoluminescence peaks in the ultra-violet region, and no sign of quantum confined Stark effect is observed in the complete multiple quantum well series. The results agree well with flat band quantum well calculations. Furthermore, we show that the MQW structures are strongly polarized along the [0001] direction. The origin of the polarization is discussed in terms of the strain anisotropy dependence of the exciton optical oscillator strengths.

Materials characterization study of conductive flexible second surface mirrors

NASA Technical Reports Server (NTRS)

Levadou, F.; Bosma, S. J.; Paillous, A.

1981-01-01

The status of prequalification and qualification work on conductive flexible second surface mirrors is described. The basic material is FEP Teflon witn either aluminium or silver vacuum deposited reflectors. The top layer has been made conductive by deposition of layer of a indium oxide. The results of a prequalification program comprised of decontamination, humidity, thermal cycling, thermal shock and vibration tests are presented. Thermo-optical and electrical properties. The results of a prequalification program comprised of decontamination, humidity, thermal cycling, thermal shock and vibration tests are presented. Thermo-optical and electrical properties, the electrostatic behavior of the materials under simulated substorm environment and electrical conductivity at low temperatures are characterized. The effects of simulated ultra violet and particles irradiation on electrical and thermo-optical properties of the materials are also presented.

Schottky barrier diode and method thereof

NASA Technical Reports Server (NTRS)

Aslam, Shahid (Inventor); Franz, David (Inventor)

2008-01-01

Pt/n.sup.-GaN Schottky barrier diodes are disclosed that are particularly suited to serve as ultra-violet sensors operating at wavelengths below 200 nm. The Pt/n.sup.-GaN Schottky barrier diodes have very large active areas, up to 1 cm.sup.2, which exhibit extremely low leakage current at low reverse biases. Very large area Pt/n.sup.-GaN Schottky diodes of sizes 0.25 cm.sup.2 and 1 cm.sup.2 have been fabricated from n.sup.-/n.sup.+ GaN epitaxial layers grown by vapor phase epitaxy on single crystal c-plane sapphire, which showed leakage currents of 14 pA and 2.7 nA, respectively for the 0.25 cm.sup.2 and 1 cm.sup.2 diodes both configured at a 0.5V reverse bias.

Velocity-gauge real-time TDDFT within a numerical atomic orbital basis set

DOE Office of Scientific and Technical Information (OSTI.GOV)

Pemmaraju, C. D.; Vila, F. D.; Kas, J. J.

The interaction of laser fields with solid-state systems can be modeled efficiently within the velocity-gauge formalism of real-time time dependent density functional theory (RT-TDDFT). In this article, we discuss the implementation of the velocity-gauge RT-TDDFT equations for electron dynamics within a linear combination of atomic orbitals (LCAO) basis set framework. Numerical results obtained from our LCAO implementation, for the electronic response of periodic systems to both weak and intense laser fields, are compared to those obtained from established real-space grid and Full-Potential Linearized Augmented Planewave approaches. As a result, potential applications of the LCAO based scheme in the context ofmore » extreme ultra-violet and soft X-ray spectroscopies involving core-electronic excitations are discussed.« less

Interfacial hydrothermal synthesis of SnO{sub 2} nanorods towards photocatalytic degradation of methyl orange

DOE Office of Scientific and Technical Information (OSTI.GOV)

Hou, L.R., E-mail: houlr629@163.com; Lian, L.; Zhou, L.

2014-12-15

Highlights: • Efficient interfacial hydrothermal strategy was developed. • 1D SnO{sub 2} nanorods as an advanced photocatalyst. • SnO{sub 2} nanorods exhibit photocatalytic degradation of the MO. - Abstract: One-dimensional (1D) SnO{sub 2} nanorods (NRs) have been successfully synthesized by means of an efficient interfacial hydrothermal strategy. The resulting product was physically characterized by X-ray powder diffraction, scanning electron microscopy, transmission electron microscope, etc. The as-fabricated SnO{sub 2} NRs exhibited excellent photocatalytic degradation of the methyl orange with high degradation efficiency of 99.3% with only 60 min ultra violet light irradiation. Meanwhile, the 1D SnO{sub 2} NRs exhibited intriguing photostabilitymore » after four recycles.« less

Vacuum ultraviolet photoabsorption of prime ice analogues of Pluto and Charon

NASA Astrophysics Data System (ADS)

Pavithraa, S.; Lo, J.-I.; Rahul, K.; Raja Sekhar, B. N.; Cheng, B.-M.; Mason, N. J.; Sivaraman, B.

2018-02-01

Here we present the first Vacuum UltraViolet (VUV) photoabsorption spectra of ice analogues of Pluto and Charon ice mixtures. For Pluto the ice analogue is an icy mixture containing nitrogen (N2), carbon monoxide (CO), methane (CH4) and water (H2O) prepared with a 100:1:1:3 ratio, respectively. Photoabsorption of icy mixtures with and without H2O were recorded and no significant changes in the spectra due to presence of H2O were observed. For Charon a VUV photoabsorption spectra of an ice analogue containing ammonia (NH3) and H2O prepared with a 1:1 ratio was recorded, a spectrum of ammonium hydroxide (NH4OH) was also recorded. These spectra may help to interpret the P-Alice data from New Horizons.

Preparation of Ag-loaded octahedral Bi2WO6 photocatalyst and its photocatalytic activity

NASA Astrophysics Data System (ADS)

An, Liang; Wang, Guanghui; Zhou, Xuan; Wang, Yi; Gao, Fang; Cheng, Yang

2014-12-01

In this work, an Ag-loaded octahedral Bi2WO6 photocatalyst has been successfully prepared by the hydrothermal method and photo deposition method. X-ray diffraction (XRD), energy dispersive analysis of X-ray (EDX), field-emission scanning electron microscopy (FE-SEM) and ultra-violet adsorption spectrum (UV-Vis) were employed for characterization of the composite photocatalyst. Furthermore, two different photocatalysts including the obtained Ag-loaded octahedral Bi2WO6 were employed here for photodegradation of model contaminated water of Orange II (OII). Results show that Ag-loaded Bi2WO6 photocatalyst exhibits superior photocatalytic properties compared to the undoped Bi2WO6. The reasons for improvement in photocatalytic activity of the Ag-loaded octahedral Bi2WO6 were also discussed.

Probing molecular orientations in thin films by x-ray photoelectron spectroscopy

NASA Astrophysics Data System (ADS)

Li, Y.; Li, P.; Lu, Z.-H.

2018-03-01

A great number of functional organic molecules in active thin-film layers of optoelectronic devices have highly asymmetric structures, such as plate-like, rod-like, etc. This makes molecular orientation an important aspect in thin-films as it can significantly affect both the optical and electrical performance of optoelectronic devices. With a combination of in-situ ultra violet photoelectron spectroscopy (UPS) and x-ray photoelectron spectroscopy (XPS) investigations for organic molecules having a broad range of structural properties, we discovered a rigid connection of core levels and frontier highest occupied molecular orbital levels at organic interfaces. This finding opens up opportunities of using X-ray photoemission spectroscopy as an alternative tool to UPS for providing an easy and unambiguous data interpretation in probing molecular orientations.

Optical integration of SPO mirror modules in the ATHENA telescope

NASA Astrophysics Data System (ADS)

Valsecchi, G.; Marioni, F.; Bianucci, G.; Zocchi, F. E.; Gallieni, D.; Parodi, G.; Ottolini, M.; Collon, M.; Civitani, M.; Pareschi, G.; Spiga, D.; Bavdaz, M.; Wille, E.

2017-08-01

ATHENA (Advanced Telescope for High-ENergy Astrophysics) is the next high-energy astrophysical mission selected by the European Space Agency for launch in 2028. The X-ray telescope consists of 1062 silicon pore optics mirror modules with a target angular resolution of 5 arcsec. Each module must be integrated on a 3 m structure with an accuracy of 1.5 arcsec for alignment and assembly. This industrial and scientific team is developing the alignment and integration process of the SPO mirror modules based on ultra-violet imaging at the 12 m focal plane. This technique promises to meet the accuracy requirement while, at the same time, allowing arbitrary integration sequence and mirror module exchangeability. Moreover, it enables monitoring the telescope point spread function during the planned 3-year integration phase.

Formation of star tracking reticles

NASA Technical Reports Server (NTRS)

Smith, W. O.; Toft, A. R. (Inventor)

1974-01-01

The present application is directed towards a process for producing high resolution, substantially non-reflective reticles or choppers suitable for use for transmitting in both the visible and near ultra-violet regions, able to withstand reasonable handling and extreme environmental conditions, and capable of operating at speeds of from 2800 to about 9000 revolutions per minute without distortion. In particular, the present invention is directed towards the production or reticles having a quartz base vacuum coated with chromium, chromium-silver alloy, and silver with electrodeposited copper and black chromium thereon, respectively, in the form of a reticle pattern. The quartz permits the transmission of light while the pattern is opaque to light. The reticles of the present invention are intended for use in optical trackers, such as star trackers used in outer space.

Directional Degradation of Spectralon Diffuser Under Ionizing Radiation for Calibration of Space-Based Sensors

NASA Technical Reports Server (NTRS)

Georgiev, G. T.; Butler, J. J.; Kowalewski, M. G.; Ding, L.

2012-01-01

Assessment of the effect of Vacuum Ultra Violet (VUV) irradiation on the Bidirectional Reflectance Distribution Function (BRDF) of Spectralon is presented in this paper. The sample was a 99% white Spectralon calibration standard irradiated with VUV source positioned at 60o off the irradiation direction for a total of 20 hours. The BRDF before and after VUV irradiation was measured and compared at number of wavelengths in the UV, VIS and IR. Non-isotropic directional degradation of Spectralon diffuser under ionizing radiation was detected at different BRDF measurement geometries primarily at UV spectral range. The 8o directional/hemispherical reflectance of the same sample was also measured and compared from 200nm to 2500nm. Index Terms BRDF, Reflectance, Multiangular, Spectralon, Remote Sensing

Optical properties of γ-irradiated Bombyx mori silk fibroin films

NASA Astrophysics Data System (ADS)

Madhukumar, R.; Asha, S.; Lakshmeesha Rao, B.; Sarojini, B. K.; Byrappa, K.; Wang, Youjiang; Sangappa, Y.

2015-11-01

In the present work the Bombyx mori silk fibroin (SF) films were prepared by the solution casting method and effects of γ-irradiation on the optical properties and optical constants of the films have been studied by using Ultra Violet-Visible (UV-Vis) spectrophotometer. The recorded UV-Vis absorption and transmission spectra have been used to determine the optical band gap (Eg), refractive index (n), extinction coefficient (k), optical conductivity (σopt) and dielectric constants (ε*) of virgin and γ-irradiated films. Reduction in optical band gap and increase in refractive index with increasing radiation dosage were observed. It is also found that there is an increase in dielectric constants with increasing photon energy. The obtained results reveal that the refractive index of the SF films may be efficiently changed by γ-irradiation.

Pentaerythritol Tetranitrate (PETN) Surveillance by HPLC-MS: Instrumental Parameters Development

DOE Office of Scientific and Technical Information (OSTI.GOV)

Harvey, C A; Meissner, R

Surveillance of PETN Homologs in the stockpile here at LLNL is currently carried out by high performance liquid chromatography (HPLC) with ultra violet (UV) detection. Identification of unknown chromatographic peaks with this detection scheme is severely limited. The design agency is aware of the limitations of this methodology and ordered this study to develop instrumental parameters for the use of a currently owned mass spectrometer (MS) as the detection system. The resulting procedure would be a ''drop-in'' replacement for the current surveillance method (ERD04-524). The addition of quadrupole mass spectrometry provides qualitative identification of PETN and its homologs (Petrin, DiPEHN,more » TriPEON, and TetraPEDN) using a LLNL generated database, while providing mass clues to the identity of unknown chromatographic peaks.« less

Spectral downshifting in MBO3:Nd3+ (M=Y, La) phosphor

NASA Astrophysics Data System (ADS)

Omanwar, S. K.; Sawala, N. S.

2017-11-01

The spectral downshifting (DS) from ultra-violet (UV)/visible (VIS) light to near infra-red (NIR) radiation in Nd3+ doped YBO3 and LaBO3 phosphors is reported. The prepared materials were characterized by X-ray powder diffraction (XRD) and photoluminescence (PL) properties along with time-decay curves were studied which confirmed the spectral DS from VIS to NIR radiation. This can be employed to overcome the spectral mismatch of crystalline silicon (c-Si) solar cell with solar spectrum. The prepared Nd3+ doped as prepared phosphors provide NIR emission (1052 nm) at excitation of 586 nm where response of c-Si solar cell was optimum. Thus spectral modification by mentioned phosphor can be utilized to improve solar cells performance. Hence these phosphors have potential application for photovoltaic (PV) technology.

Parameter optimization for Ag-coated TiO2 nanotube arrays as recyclable SERS substrates

NASA Astrophysics Data System (ADS)

Sun, Yuyang; Yang, Lulu; Liao, Fan; Dang, Qian; Shao, Mingwang

2018-06-01

The Ag-coated titanium dioxide nanotube arrays (Ag-coated TNTs) are obtained via the deposition of Ag nanoparticles on the two-step anodized TNTs. The wall thickness of TNTs is modulated via finite difference time domain simulation to get the favorable electromagnetic field for surface enhanced Raman scattering (SERS). Ag-coated TNTs with optimal wall thickness of 20 nm were employed as the SERS substrates to detect 2-mercaptobenzoxazole, which show superior detection sensitivity and uniformity. In addition, due to the photocatalysis of TNTs, the SERS substrates could clean themselves and be repeatedly used by photo-degradation of target molecules under the ultra-violet irradiation. The Ag-coated TNTs are a kind of bifunctional SERS substrates which can produce high-quality SERS signals and reuse to reduce the cost.

Left Limb of North Pole of the Sun, March 20, 2007 (Anaglyph)

NASA Technical Reports Server (NTRS)

2007-01-01

[figure removed for brevity, see original site] [figure removed for brevity, see original site] Figure 1: Left eye view of a stereo pair Click on the image for full resolution TIFF Figure 2: Right eye view of a stereo pair Click on the image for full resolution TIFF Figure 1: This image was taken by the SECCHI Extreme UltraViolet Imager (EUVI) mounted on the STEREO-B spacecraft. STEREO-B is located behind the Earth, and follows the Earth in orbit around the Sun. This location enables us to view the Sun from the position of a virtual left eye in space. Figure 2: This image was taken by the SECCHI Extreme UltraViolet Imager (EUVI) mounted on the STEREO-A spacecraft. STEREO-A is located ahead of the Earth, and leads the Earth in orbit around the Sun, This location enables us to view the Sun from the position of a virtual right eye in space.

NASA's Solar TErrestrial RElations Observatory (STEREO) satellites have provided the first three-dimensional images of the Sun. For the first time, scientists will be able to see structures in the Sun's atmosphere in three dimensions. The new view will greatly aid scientists' ability to understand solar physics and thereby improve space weather forecasting.

This image is a composite of left and right eye color image pairs taken by the SECCHI Extreme UltraViolet Imager (EUVI) mounted on the STEREO-B and STEREO-A spacecraft. STEREO-B is located behind the Earth, and follows the Earth in orbit around the Sun, This location enables us to view the Sun from the position of a virtual left eye in space. STEREO-A is located ahead of the Earth, and leads the Earth in orbit around the Sun, This location enables us to view the Sun from the position of a virtual right eye in space.

The EUVI imager is sensitive to wavelengths of light in the extreme ultraviolet portion of the spectrum. EUVI bands at wavelengths of 304, 171 and 195 Angstroms have been mapped to the red blue and green visible portion of the spectrum; and processed to emphasize the three-dimensional structure of the solar material.

STEREO, a two-year mission, launched October 2006, will provide a unique and revolutionary view of the Sun-Earth System. The two nearly identical observatories -- one ahead of Earth in its orbit, the other trailing behind -- will trace the flow of energy and matter from the Sun to Earth. They will reveal the 3D structure of coronal mass ejections; violent eruptions of matter from the sun that can disrupt satellites and power grids, and help us understand why they happen. STEREO will become a key addition to the fleet of space weather detection satellites by providing more accurate alerts for the arrival time of Earth-directed solar ejections with its unique side-viewing perspective.

STEREO is the third mission in NASA's Solar Terrestrial Probes program within NASA's Science Mission Directorate, Washington. The Goddard Science and Exploration Directorate manages the mission, instruments, and science center. The Johns Hopkins University Applied Physics Laboratory, Laurel, Md., designed and built the spacecraft and is responsible for mission operations. The imaging and particle detecting instruments were designed and built by scientific institutions in the U.S., UK, France, Germany, Belgium, Netherlands, and Switzerland. JPL is a division of the California Institute of Technology in Pasadena.

Results from the IMP-J violet solar cell experiment and violet cell balloon flights

NASA Technical Reports Server (NTRS)

Gaddy, E. M.

1976-01-01

The Interplanetary Monitoring Platform-J violet solar cell experiment was flown in an orbit with mild thermal cycling and low hard-particle radiation. The results of the experiment show that violet cells degrade at about the same rate as conventional cells in such an orbit. Balloon flight measurements show that violet solar cells produce approximately 20% more power than conventional cells.

Results from the IMP-J violet solar cell experiment and violet cell balloon flights

NASA Technical Reports Server (NTRS)

Gaddy, E. M.

1976-01-01

The IMP-J violet solar cell experiment was flown in an orbit with mild thermal cycling and low hard particle radiation. The results of the experiment show that violet cells degrade at about the same rate as conventional cells in such an orbit. Balloon flight measurements show that violet solar cells produce approximately 20% more power than conventional cells.

EUVE observations of the Moon

NASA Technical Reports Server (NTRS)

Gladstone, G. R.; Mcdonald, J. S.; Boyd, W. T.

1993-01-01

During its all-sky survey, the Extreme Ultraviolet Explorer (EUVE) satellite observed the Moon several times at first and last quarters, and once near the Dec. 10, 1992 lunar eclipse. We present a preliminary reduction and analysis of this data, in the form of EUV images of the Moon and derived albedos.

Coordinated ASCA/EUVE/XTE Observations of Algol

NASA Technical Reports Server (NTRS)

Stern, Robert A.

1997-01-01

EUVE, Advanced Satellite for Cosmology and Astrophysics (ASCA), and X-ray Timing Explorer (XTE) observed the eclipsing binary Algol (Beta Per) from 1-7 Feb 1996. The coordinated observation covered approx. 2 binary orbits of the system, with a net exposure of approx. 160 ksec for EUVE, 40 ksec for ASCA (in 4 pointings), and 90 ksec for XTE (in 45 pointings). We discuss results of modeling the combined EUVE, ASCA, and XTE data using continuous differential emission measure distributions, and provide constraints on the abundance in the Algol system.

The Extreme Ultraviolet Explorer

NASA Technical Reports Server (NTRS)

Malina, R. F.; Bowyer, S.; Lampton, M.; Finley, D.; Paresce, F.; Penegor, G.; Heetderks, H.

1982-01-01

The Extreme Ultraviolet Explorer Mission is described. The purpose of this mission is to search the celestial sphere for astronomical sources of extreme ultraviolet (EUV) radiation (100 to 1000 A). The search will be accomplished with the use of three EUV telescopes, each sensitive to different bands within the EUV band. A fourth telescope will perform a higher sensitivity search of a limited sample of the sky in a single EUV band. In six months, the entire sky will be scanned at a sensitivity level comparable to existing surveys in other more traditional astronomical bandpasses.

EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity, and LWR tradeoffs

NASA Astrophysics Data System (ADS)

Putna, E. Steve; Younkin, Todd R.; Chandhok, Manish; Frasure, Kent

2009-03-01

The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 32nm half-pitch node and beyond. Readiness of EUV materials is currently one high risk area according to assessments made at the 2008 EUVL Symposium. The main development issue regarding EUV resist has been how to simultaneously achieve high sensitivity, high resolution, and low line width roughness (LWR). This paper describes the strategy and current status of EUV resist development at Intel Corporation. Data is presented utilizing Intel's Micro-Exposure Tool (MET) examining the feasibility of establishing a resist process that simultaneously exhibits <=30nm half-pitch (HP) L/S resolution at <=10mJ/cm2 with <=4nm LWR.

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

NASA Astrophysics Data System (ADS)

Putna, E. Steve; Younkin, Todd R.; Caudillo, Roman; Chandhok, Manish

2010-04-01

The International Technology Roadmap for Semiconductors (ITRS) denotes Extreme Ultraviolet (EUV) lithography as a leading technology option for realizing the 22nm half pitch node and beyond. Readiness of EUV materials is currently one high risk area according to recent assessments made at the 2009 EUVL Symposium. The main development issue regarding EUV resist has been how to simultaneously achieve high sensitivity, high resolution, and low line width roughness (LWR). This paper describes the strategy and current status of EUV resist development at Intel Corporation. Data collected utilizing Intel's Micro-Exposure Tool (MET) is presented in order to examine the feasibility of establishing a resist process that simultaneously exhibits <=22nm half-pitch (HP) L/S resolution at <= 12.5mJ/cm2 with <= 4nm LWR.

Utilizing the EUVE Innovative Technology Testbed to Reduce Operations Cost for Present and Future Orbiting Mission

NASA Technical Reports Server (NTRS)

1997-01-01

This report summarizes work done under Cooperative Agreement (CA) on the following testbed projects: TERRIERS - The development of the ground systems to support the TERRIERS satellite mission at Boston University (BU). HSTS - The application of ARC's Heuristic Scheduling Testbed System (HSTS) to the EUVE satellite mission. SELMON - The application of NASA's Jet Propulsion Laboratory's (JPL) Selective Monitoring (SELMON) system to the EUVE satellite mission. EVE - The development of the EUVE Virtual Environment (EVE), a prototype three-dimensional (3-D) visualization environment for the EUVE satellite and its sensors, instruments, and communications antennae. FIDO - The development of the Fault-Induced Document Officer (FIDO) system, a prototype application to respond to anomalous conditions by automatically searching for, retrieving, and displaying relevant documentation for an operators use.

Protection efficiency of a standard compliant EUV reticle handling solution

NASA Astrophysics Data System (ADS)

He, Long; Lystad, John; Wurm, Stefan; Orvek, Kevin; Sohn, Jaewoong; Ma, Andy; Kearney, Patrick; Kolbow, Steve; Halbmaier, David

2009-03-01

For successful implementation of extreme ultraviolet lithography (EUVL) technology for late cycle insertion at 32 nm half-pitch (hp) and full introduction for 22 nm hp high volume production, the mask development infrastructure must be in place by 2010. The central element of the mask infrastructure is contamination-free reticle handling and protection. Today, the industry has already developed and balloted an EUV pod standard for shipping, transporting, transferring, and storing EUV masks. We have previously demonstrated that the EUV pod reticle handling method represents the best approach in meeting EUVL high volume production requirements, based on then state-of-the-art inspection capability at ~53nm polystyrene latex (PSL) equivalent sensitivity. In this paper, we will present our latest data to show defect-free reticle handling is achievable down to 40 nm particle sizes, using the same EUV pod carriers as in the previous study and the recently established world's most advanced defect inspection capability of ~40 nm SiO2 equivalent sensitivity. The EUV pod is a worthy solution to meet EUVL pilot line and pre-production exposure tool development requirements. We will also discuss the technical challenges facing the industry in refining the EUV pod solution to meet 22 nm hp EUVL production requirements and beyond.

Electrical comparison of iN7 EUV hybrid and EUV single patterning BEOL metal layers

NASA Astrophysics Data System (ADS)

Larivière, Stéphane; Wilson, Christopher J.; Kutrzeba Kotowska, Bogumila; Versluijs, Janko; Decoster, Stefan; Mao, Ming; van der Veen, Marleen H.; Jourdan, Nicolas; El-Mekki, Zaid; Heylen, Nancy; Kesters, Els; Verdonck, Patrick; Béral, Christophe; Van den Heuvel, Dieter; De Bisschop, Peter; Bekaert, Joost; Blanco, Victor; Ciofi, Ivan; Wan, Danny; Briggs, Basoene; Mallik, Arindam; Hendrickx, Eric; Kim, Ryoung-han; McIntyre, Greg; Ronse, Kurt; Bömmels, Jürgen; Tőkei, Zsolt; Mocuta, Dan

2018-03-01

The semiconductor scaling roadmap shows the continuous node to node scaling to push Moore's law down to the next generations. In that context, the foundry N5 node requires 32nm metal pitch interconnects for the advanced logic Back- End of Line (BEoL). 193immersion usage now requires self-aligned and/or multiple patterning technique combinations to enable such critical dimension. On the other hand, EUV insertion investigation shows that 32nm metal pitch is still a challenge but, related to process flow complexity, presents some clear motivations. Imec has already evaluated on test chip vehicles with different patterning approaches: 193i SAQP (Self-Aligned Quadruple Patterning), LE3 (triple patterning Litho Etch), tone inversion, EUV SE (Single Exposure) with SMO (Source-mask optimization). Following the run path in the technology development for EUV insertion, imec N7 platform (iN7, corresponding node to the foundry N5) is developed for those BEoL layers. In this paper, following technical motivation and development learning, a comparison between the iArF SAQP/EUV block hybrid integration scheme and a single patterning EUV flow is proposed. These two integration patterning options will be finally compared from current morphological and electrical criteria.

Clean induced feature CD shift of EUV mask

NASA Astrophysics Data System (ADS)

Nesládek, Pavel; Schedel, Thorsten; Bender, Markus

2016-05-01

EUV developed in the last decade to the most promising <7nm technology candidate. Defects are considered to be one of the most critical issues of the EUV mask. There are several contributors which make the EUV mask so different from the optical one. First one is the significantly more complicated mask stack consisting currently of 40 Mo/Si double layers, covered by Ru capping layer and TaN/TaO absorber/anti-reflective coating on top of the front face of the mask. Backside is in contrary to optical mask covered as well by conductive layer consisting of Cr or CrN. Second contributor is the fact that EUV mask is currently in contrary to optical mask not yet equipped with sealed pellicle, leading to much higher risk of mask contamination. Third reason is use of EUV mask in vacuum, possibly leading to deposition of vacuum contaminants on the EUV mask surface. Latter reason in combination with tight requirements on backside cleanliness lead to the request of frequent recleaning of the EUV mask, in order to sustain mask lifetime similar to that of optical mask. Mask cleaning process alters slightly the surface of any mask - binary COG mask, as well as phase shift mask of any type and naturally also of the EUV mask as well. In case of optical masks the changes are almost negligible, as the mask is exposed to max. 10-20 re-cleans within its life time. These modifications can be expressed in terms of different specified parameters, e.g. CD shift, phase/trans shift, change of the surface roughness etc. The CD shift, expressed as thinning (or exceptionally thickening) of the dark features on the mask is typically in order of magnitude 0.1nm per process run, which is completely acceptable for optical mask. Projected on the lifetime of EUV mask, assuming 100 clean process cycles, this will lead to CD change of about 10nm. For this reason the requirements for EUV mask cleaning are significantly tighter, << 0.1 nm per process run. This task will look even more challenging, when considering, that the tools for CD measurement at the EUV mask are identical as for optical mask. There is one aspect influencing the CD shift, which demands attention. The mask composition of the EUV mask is significantly different from the optical mask. More precisely there are 2 materials influencing the estimated CD in case of EUV mask, whereas there is one material only in case of optical masks, in first approximation. For optical masks, the CD changes can be attributed to modification of the absorber/ARC layer, as the quartz substrate can be hardly modified by the wet process. For EUV Masks chemical modification of the Ru capping layer - thinning, oxidization etc. are rather more probable and we need to take into account, how this effects can influence the CD measurement process. CD changes measured can be interpreted as either change in the feature size, or modification of the chemical nature of both absorber/ARC layer stack and the Ru capping layer. In our work we try to separate the effect of absorber and Ru/capping layer on the CD shift observed and propose independent way of estimation both parameters.

Probing the Production of Extreme-ultraviolet Late-phase Solar Flares Using the Model Enthalpy-based Thermal Evolution of Loops

NASA Astrophysics Data System (ADS)

Dai, Yu; Ding, Mingde

2018-04-01

Recent observations in extreme-ultraviolet (EUV) wavelengths reveal an EUV late phase in some solar flares that is characterized by a second peak in warm coronal emissions (∼3 MK) several tens of minutes to a few hours after the soft X-ray (SXR) peak. Using the model enthalpy-based thermal evolution of loops (EBTEL), we numerically probe the production of EUV late-phase solar flares. Starting from two main mechanisms of producing the EUV late phase, i.e., long-lasting cooling and secondary heating, we carry out two groups of numerical experiments to study the effects of these two processes on the emission characteristics in late-phase loops. In either of the two processes an EUV late-phase solar flare that conforms to the observational criteria can be numerically synthesized. However, the underlying hydrodynamic and thermodynamic evolutions in late-phase loops are different between the two synthetic flare cases. The late-phase peak due to a long-lasting cooling process always occurs during the radiative cooling phase, while that powered by a secondary heating is more likely to take place in the conductive cooling phase. We then propose a new method for diagnosing the two mechanisms based on the shape of EUV late-phase light curves. Moreover, from the partition of energy input, we discuss why most solar flares are not EUV late flares. Finally, by addressing some other factors that may potentially affect the loop emissions, we also discuss why the EUV late phase is mainly observed in warm coronal emissions.

EUV and Magnetic Activities Associated with Type-I Solar Radio Bursts

NASA Astrophysics Data System (ADS)

Li, C. Y.; Chen, Y.; Wang, B.; Ruan, G. P.; Feng, S. W.; Du, G. H.; Kong, X. L.

2017-06-01

Type-I bursts ( i.e. noise storms) are the earliest-known type of solar radio emission at the meter wavelength. They are believed to be excited by non-thermal energetic electrons accelerated in the corona. The underlying dynamic process and exact emission mechanism still remain unresolved. Here, with a combined analysis of extreme ultraviolet (EUV), radio and photospheric magnetic field data of unprecedented quality recorded during a type-I storm on 30 July 2011, we identify a good correlation between the radio bursts and the co-spatial EUV and magnetic activities. The EUV activities manifest themselves as three major brightening stripes above a region adjacent to a compact sunspot, while the magnetic field there presents multiple moving magnetic features (MMFs) with persistent coalescence or cancelation and a morphologically similar three-part distribution. We find that the type-I intensities are correlated with those of the EUV emissions at various wavelengths with a correlation coefficient of 0.7 - 0.8. In addition, in the region between the brightening EUV stripes and the radio sources there appear consistent dynamic motions with a series of bi-directional flows, suggesting ongoing small-scale reconnection there. Mainly based on the induced connection between the magnetic motion at the photosphere and the EUV and radio activities in the corona, we suggest that the observed type-I noise storms and the EUV brightening activities are the consequence of small-scale magnetic reconnection driven by MMFs. This is in support of the original proposal made by Bentley et al. ( Solar Phys. 193, 227, 2000).

EUV efficiency of a 6000-grooves per mm diffraction grating

NASA Technical Reports Server (NTRS)

Hurwitz, Mark; Bowyer, Stuart; Edelstein, Jerry; Harada, Tatsuo; Kita, Toshiaki

1990-01-01

In order to explore whether grooves ruled mechanically at a density of 6000 per mm can perform well at EUV wavelengths, a sample grating is measured with this density in an EUV calibration facility. Measurements are presented of the planar uniform line-space diffraction grating's efficiency and large-angle scattering.

A study of EUV emission from the O4f star Zeta Puppis

NASA Technical Reports Server (NTRS)

Waldron, Wayne L.; Vallerga, John

1995-01-01

Our 20 ks observation did not allow us to carry out our primary objective, i.e., to test the limitations of deeply embedded EUV and X-ray sources. However, it did provide a very useful constraint in our analysis of a newly acquired high S/N ROSAT PSPC X-ray spectrum of Zeta Pup. In addition, modifications to our stellar wind opacity code have been preformed to investigate the sensitivity of the EUV opacity energy range to different photospheric model flux inputs and different wind structures. These analyses provided the justification for a 140 ks follow up EUVE Cycle III observation of this star. We have recently been informed that our requested observation has been accepted as a Type 1 target for Cycle III. The remainder of this report focuses on the following: (1) a brief background on the status of X-ray emission from OB stars; (2) a discussion on the importance of EUV observations; (3) a discussion of our scientific objectives; and (4) a summary of our technical approach for our Cycle III observation (including the predicted EUV counts for various lines.)

Correlation of experimentally measured atomic scale properties of EUV photoresist to modeling performance: an exploration

NASA Astrophysics Data System (ADS)

Kandel, Yudhishthir; Chandonait, Jonathan; Melvin, Lawrence S.; Marokkey, Sajan; Yan, Qiliang; Grzeskowiak, Steven; Painter, Benjamin; Denbeaux, Gregory

2017-03-01

Extreme ultraviolet (EUV) lithography at 13.5 nm stands at the crossroads of next generation patterning technology for high volume manufacturing of integrated circuits. Photo resist models that form the part of overall pattern transform model for lithography play a vital role in supporting this effort. The physics and chemistry of these resists must be understood to enable the construction of accurate models for EUV Optical Proximity Correction (OPC). In this study, we explore the possibility of improving EUV photo-resist models by directly correlating the parameters obtained from experimentally measured atomic scale physical properties; namely, the effect of interaction of EUV photons with photo acid generators in standard chemically amplified EUV photoresist, and associated electron energy loss events. Atomic scale physical properties will be inferred from the measurements carried out in Electron Resist Interaction Chamber (ERIC). This study will use measured physical parameters to establish a relationship with lithographically important properties, such as line edge roughness and CD variation. The data gathered from these measurements is used to construct OPC models of the resist.

Laboratory calibration of density-dependent lines in the extreme ultraviolet spectral region

NASA Astrophysics Data System (ADS)

Lepson, J. K.; Beiersdorfer, P.; Gu, M. F.; Desai, P.; Bitter, M.; Roquemore, L.; Reinke, M. L.

2012-05-01

We have been making spectral measurements in the extreme ultraviolet (EUV) from different laboratory sources in order to investigate the electron density dependence of various astrophysically important emission lines and to test the atomic models underlying the diagnostic line ratios. The measurement are being performed at the Livermore EBIT-I electron beam ion trap, the National Spherical Torus Experiment (NSTX) at Princeton, and the Alcator C-Mod tokamak at the Massachusetts Institute of Technology, which together span an electron density of four orders of magnitude and which allow us to test the various models at high and low density limits. Here we present measurements of Fe XXII and Ar XIV, which include new data from an ultra high resolution (λ/Δλ >4000) spectrometer at the EBIT-I facility. We found good agreement between the measurements and modeling calculations for Fe XXII, but poorer agreement for Ar XIV.

The EUVE Proposal Database

NASA Astrophysics Data System (ADS)

Christian, C. A.; Olson, E. C.

1993-01-01

The proposal database and scheduling system for the Extreme Ultraviolet Explorer is described. The proposal database has been implemented to take input for approved observations selected by the EUVE Peer Review Panel and output target information suitable for the scheduling system to digest. The scheduling system is a hybrid of the SPIKE program and EUVE software which checks spacecraft constraints, produces a proposed schedule and selects spacecraft orientations with optimal configurations for acquiring star trackers, etc. This system is used to schedule the In Orbit Calibration activities that took place this summer, following the EUVE launch in early June 1992. The strategy we have implemented has implications for the selection of approved targets, which have impacted the Peer Review process. In addition, we will discuss how the proposal database, founded on Sybase, controls the processing of EUVE Guest Observer data.

Spectroscopy and Photometry of EUVE J1429-38.0:An Eclipsing Magnetic Cataclysmic Variable

NASA Astrophysics Data System (ADS)

Howell, Steve B.; Craig, Nahide; Roberts, Bryce; McGee, Paddy; Sirk, Martin

1997-06-01

EUVE J1429-38.0 was originally discovered as a variable source by the Extreme Ultraviolet Explorer (EUVE) satellite. We present new optical observations which unambiguously confirm this star to be an eclipsing magnetic system with an orbital period of 4() h 46() m. The photometric data are strongly modulated by ellipsoidal variations during low states which allow a system inclination of near 80 degrees to be determined. Our time-resolved optical spectra, which cover only about one-third of the orbital cycle, indicate the clear presence of a gas stream. During high states, EUVE J1429-38.0 shows ~ 1 mag deep eclipses and the apparent formation of a partial accretion disk. EUVE J1429-38.0 presents the observer with properties of both the AM Herculis and the DQ Herculis types of magnetic cataclysmic variable.

EUV Irradiance Inputs to Thermospheric Density Models: Open Issues and Path Forward

NASA Astrophysics Data System (ADS)

Vourlidas, A.; Bruinsma, S.

2018-01-01

One of the objectives of the NASA Living With a Star Institute on "Nowcasting of Atmospheric Drag for low Earth orbit (LEO) Spacecraft" was to investigate whether and how to increase the accuracy of atmospheric drag models by improving the quality of the solar forcing inputs, namely, extreme ultraviolet (EUV) irradiance information. In this focused review, we examine the status of and issues with EUV measurements and proxies, discuss recent promising developments, and suggest a number of ways to improve the reliability, availability, and forecast accuracy of EUV measurements in the next solar cycle.

Carbon contamination topography analysis of EUV masks

DOE Office of Scientific and Technical Information (OSTI.GOV)

Fan, Y.-J.; Yankulin, L.; Thomas, P.

2010-03-12

The impact of carbon contamination on extreme ultraviolet (EUV) masks is significant due to throughput loss and potential effects on imaging performance. Current carbon contamination research primarily focuses on the lifetime of the multilayer surfaces, determined by reflectivity loss and reduced throughput in EUV exposure tools. However, contamination on patterned EUV masks can cause additional effects on absorbing features and the printed images, as well as impacting the efficiency of cleaning process. In this work, several different techniques were used to determine possible contamination topography. Lithographic simulations were also performed and the results compared with the experimental data.

Identification of methyl violet 2B as a novel blocker of focal adhesion kinase signaling pathway in cancer cells

DOE Office of Scientific and Technical Information (OSTI.GOV)

Kim, Hwan; Translational Research Center for Protein Function Control; Kim, Nam Doo

2013-07-26

Highlights: •FAK signaling cascade in cancer cells is profoundly inhibited by methyl violet 2B. •Methyl violet 2B identified by virtual screening is a novel allosteric FAK inhibitor. •Methyl violet 2B possesses extremely high kinase selectivity. •Methyl violet 2B suppresses strongly the proliferation of cancer cells. •Methyl violet 2B inhibits focal adhesion, invasion and migration of cancer cells. -- Abstract: The focal adhesion kinase (FAK) signaling cascade in cancer cells was profoundly inhibited by methyl violet 2B identified with the structure-based virtual screening. Methyl violet 2B was shown to be a non-competitive inhibitor of full-length FAK enzyme vs. ATP. It turnedmore » out that methyl violet 2B possesses extremely high kinase selectivity in biochemical kinase profiling using a large panel of kinases. Anti-proliferative activity measurement against several different cancer cells and Western blot analysis showed that this substance is capable of suppressing significantly the proliferation of cancer cells and is able to strongly block FAK/AKT/MAPK signaling pathways in a dose dependent manner at low nanomolar concentration. Especially, phosphorylation of Tyr925-FAK that is required for full activation of FAK was nearly completely suppressed even with 1 nM of methyl violet 2B in A375P cancer cells. To the best of our knowledge, it has never been reported that methyl violet possesses anti-cancer effects. Moreover, methyl violet 2B significantly inhibited FER kinase phosphorylation that activates FAK in cell. In addition, methyl violet 2B was found to induce cell apoptosis and to exhibit strong inhibitory effects on the focal adhesion, invasion, and migration of A375P cancer cells at low nanomolar concentrations. Taken together, these results show that methyl violet 2B is a novel, potent and selective blocker of FAK signaling cascade, which displays strong anti-proliferative activities against a variety of human cancer cells and suppresses adhesion/migration/invasion of tumor cells.« less

Protective isolation in single-bed rooms: studies in a modified hospital ward

PubMed Central

Ayliffe, G. A. J.; Collins, B. J.; Lowbury, E. J. L.; Wall, Mary

1971-01-01

Studies were made in a modified hospital ward containing 19 beds, 14 of them in the open ward, one in a window-ventilated side-room, two in rooms with partial-recirculation ventilators giving 7-10 air changes per hour, and two in self-contained isolation suites with plenum ventilation (20 air changes per hour), ultra-violet (UV) barriers at doorways and airlocks. Preliminary tests with aerosols of tracer bacteria showed that few bacteria entered the plenum or recirculation-ventilated rooms. Bacteria released inside mechanically ventilated cubicles escaped into the corridor, but this transfer was reduced by the presence of an airlock. UV barriers at the entrance to the airlock and the cubicle reduced the transfer of bacteria from cubicle to corridor. During a period of 4 years while the ward was in use for surgical and gynaecological patients, the incidence of post-operative sepsis and colonization of wounds by multiple-resistant Staphylococcus aureus was lower (though not significantly lower) in the plenum-ventilated rooms than in the open ward, the recirculator-ventilated cubicles and the window-ventilated cubicles. Nasal acquisition of multiple-resistant Staph. aureus was significantly less common in the plenum-ventilated than in the recirculator-ventilated cubicles and in the other areas. Mean counts of bacteria on settle-plates were significantly lower in the plenum-ventilated cubicles than in the other areas; mean settle-plate counts in the recirculator-ventilated cubicles were significantly lower than in the open ward and in the window-ventilated side-room; similar results were shown by slit-sampling of air. Mean settle-plate counts were significantly lower in all areas when the ward was occupied by female patients. Staph. aureus was rarely carried by air from plenum-ventilated or other cubicles to the open ward, or from the open ward to the cubicles; though staphylococci were transferred from one floor area to another, they did not appear to be redispersed into the air in sufficient numbers to infect the patients. Ultra-violet irradiation caused a significant reduction in the total and staphylococcal counts from the floors of airlocks, and a significant reduction of total counts in the air. PMID:5289715

Reionization and Galaxy Formation in Warm Dark Matter Cosmologies

NASA Astrophysics Data System (ADS)

Dayal, Pratika; Choudhury, Tirthankar Roy; Bromm, Volker; Pacucci, Fabio

2017-02-01

We compare model results from a semi-analytic (merger-tree based) framework for high-redshift (z ≃ 5-20) galaxy formation against reionization indicators, including the Planck electron scattering optical depth (τ es) and the ionizing photon emissivity ({\\dot{n}}{ion}), to shed light on the reionization history and sources in Cold (CDM) and Warm Dark Matter (WDM; particle masses of {m}x = 1.5, 3, and 5 keV) cosmologies. This model includes all of the key processes of star formation, supernova feedback, the merger/accretion/ejection driven evolution of gas and stellar mass and the effect of the ultra-violet background (UVB), created during reionization, in photo-evaporating the gas content of galaxies in halos with M h ≲ 109 {M}⊙ . We find that the delay in the start of reionization in light (1.5 keV) WDM models can be compensated by a steeper redshift evolution of the ionizing photon escape fraction and a faster mass assembly, resulting in reionization ending at comparable redshifts (z ≃ 5.5) in all the dark matter models considered. We find that the bulk of the reionization photons come from galaxies with a halo mass of M h ≲ 109 {M}⊙ and a UV magnitude of -15 ≲ M UV ≲ -10 in CDM. The progressive suppression of low-mass halos with decreasing {m}x leads to a shift in the “reionization” population to larger halo masses of M h ≳ 109 {M}⊙ and -17 ≲ M UV ≲ -13 for 1.5 keV WDM. We find that current observations of τ es and the ultra violet luminosity function are equally compatible with all the (cold and warm) dark matter models considered in this work. Quantifying the impact of the UVB on galaxy observables (luminosity functions, stellar mass densities, and stellar to halo mass ratios) for different DM models, we propose that global indicators including the redshift evolution of the stellar mass density and the stellar mass-halo mass relation, observable with the James Webb Space Telescope, can be used to distinguish between CDM and WDM (1.5 keV) cosmologies.

Time Series of SO2 Flux from Popocatépetl Volcano by an Ultra-Violet Camera with a Set of Different Band-Pass Filters

NASA Astrophysics Data System (ADS)

Schiavo, B.; Stremme, W.; Grutter, M.; Campion, R.; Rivera, C. I.; Inguaggiato, S.

2017-12-01

The measurement of SO2flux from active volcanoes are of great importance, for monitoring and hazard of volcanic activity, environmental impact and flux emissions related to changes of magmatic activity. Sulfur dioxide total flux from Popocatépetl volcano was determinad using a ultra-violet camera (or SO2 camera) with different band-pass filter. The flux is obteined from the product of the gas concentration over integrated the plume cross-section (slant column in molec/cm2 or ppm*m) and wind velocity data. Model of plume altitude and wind speed measurement are used to calculate a wind velocity, but a new method of sequential images is widely used in several years for this calculation. Volcanic plume measurements, for a total of about 60 days from from January to March 2017, were collected and utilized to generate the SO2 time series. The importance of monitoring and the time series of volcanic gas emissions is described and proven by many scientific studies. A time series of the Popocatépetl volcano will allow us to detect the volcanic gas as well as anomalies in volcanic processes and help to estimate the average SO2 flux of the volcano. We present a detailed description of the posterior correction of the dilution effect, which occurs due to a simplification of the radiative transfer equation. The correction scheme is especial applicable for long term monitoring from a permanent observation site. Images of volcanic SO2 plumes from the active Popocatépetl volcano in Mexico are presented, showing persistent passive degassing. The measurment are taken from the Altzomoni Atmospheric Observatory (19.12N, -98.65W, 3,985 m.a.s.l.), which forms part of the RUOA (www.ruoa.unam.mx) and NDACC (https://www2.acom.ucar.edu/irwg) networks. It is located north of the crater at 11 km distance. The data to calculate SO2 flux (t/d or kg/s) were recorded with the QSI UV camera and processed using Python scripts.

Evolutionary replacement of UV vision by violet vision in fish.

PubMed

Tada, Takashi; Altun, Ahmet; Yokoyama, Shozo

2009-10-13

The vertebrate ancestor possessed ultraviolet (UV) vision and many species have retained it during evolution. Many other species switched to violet vision and, then again, some avian species switched back to UV vision. These UV and violet vision are mediated by short wavelength-sensitive (SWS1) pigments that absorb light maximally (lambda(max)) at approximately 360 and 390-440 nm, respectively. It is not well understood why and how these functional changes have occurred. Here, we cloned the pigment of scabbardfish (Lepidopus fitchi) with a lambda(max) of 423 nm, an example of violet-sensitive SWS1 pigment in fish. Mutagenesis experiments and quantum mechanical/molecular mechanical (QM/MM) computations show that the violet-sensitivity was achieved by the deletion of Phe-86 that converted the unprotonated Schiff base-linked 11-cis-retinal to a protonated form. The finding of a violet-sensitive SWS1 pigment in scabbardfish suggests that many other fish also have orthologous violet pigments. The isolation and comparison of such violet and UV pigments in fish living in different ecological habitats will open an unprecedented opportunity to elucidate not only the molecular basis of phenotypic adaptations, but also the genetics of UV and violet vision.

The patterning center of excellence (CoE): an evolving lithographic enablement model

NASA Astrophysics Data System (ADS)

Montgomery, Warren; Chun, Jun Sung; Liehr, Michael; Tittnich, Michael

2015-03-01

As EUV lithography moves toward high-volume manufacturing (HVM), a key need for the lithography materials makers is access to EUV photons and imaging. The SEMATECH Resist Materials Development Center (RMDC) provided a solution path by enabling the Resist and Materials companies to work together (using SUNY Polytechnic Institute's Colleges of Nanoscale Science and Engineering (SUNY Poly CNSE) -based exposure systems), in a consortium fashion, in order to address the need for EUV photons. Thousands of wafers have been processed by the RMDC (leveraging the SUNY Poly CNSE/SEMATECH MET, SUNY Poly CNSE Alpha Demo Tool (ADT) and the SEMATECH Lawrence Berkeley MET) allowing many of the questions associated with EUV materials development to be answered. In this regard the activities associated with the RMDC are continuing. As the major Integrated Device Manufacturers (IDMs) have continued to purchase EUV scanners, Materials companies must now provide scanner based test data that characterizes the lithography materials they are producing. SUNY Poly CNSE and SEMATECH have partnered to evolve the RMDC into "The Patterning Center of Excellence (CoE)". The new CoE leverages the capability of the SUNY Poly CNSE-based full field ASML 3300 EUV scanner and combines that capability with EUV Microexposure (MET) systems resident in the SEMATECH RMDC to create an integrated lithography model which will allow materials companies to advance materials development in ways not previously possible.

SDO/AIA AND HINODE/EIS OBSERVATIONS OF INTERACTION BETWEEN AN EUV WAVE AND ACTIVE REGION LOOPS

DOE Office of Scientific and Technical Information (OSTI.GOV)

Yang, Liheng; Zhang, Jun; Li, Ting

2013-09-20

We present detailed analysis of an extreme-ultraviolet (EUV) wave and its interaction with active region (AR) loops observed by the Solar Dynamics Observatory/Atmospheric Imaging Assembly and the Hinode EUV Imaging Spectrometer (EIS). This wave was initiated from AR 11261 on 2011 August 4 and propagated at velocities of 430-910 km s{sup –1}. It was observed to traverse another AR and cross over a filament channel on its path. The EUV wave perturbed neighboring AR loops and excited a disturbance that propagated toward the footpoints of these loops. EIS observations of AR loops revealed that at the time of the wavemore » transit, the original redshift increased by about 3 km s{sup –1}, while the original blueshift decreased slightly. After the wave transit, these changes were reversed. When the EUV wave arrived at the boundary of a polar coronal hole, two reflected waves were successively produced and part of them propagated above the solar limb. The first reflected wave above the solar limb encountered a large-scale loop system on its path, and a secondary wave rapidly emerged 144 Mm ahead of it at a higher speed. These findings can be explained in the framework of a fast-mode magnetosonic wave interpretation for EUV waves, in which observed EUV waves are generated by expanding coronal mass ejections.« less

Kr photoionized plasma induced by intense extreme ultraviolet pulses

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bartnik, A., E-mail: andrzej.bartnik@wat.edu.pl; Wachulak, P.; Fiedorowicz, H.

Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Krmore » plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.« less

Nanoplasmonic generation of ultrashort EUV pulses

NASA Astrophysics Data System (ADS)

Choi, Joonhee; Lee, Dong-Hyub; Han, Seunghwoi; Park, In-Yong; Kim, Seungchul; Kim, Seung-Woo

2012-10-01

Ultrashort extreme-ultraviolet (EUV) light pulses are an important tool for time-resolved pump-probe spectroscopy to investigate the ultrafast dynamics of electrons in atoms and molecules. Among several methods available to generate ultrashort EUV light pulses, the nonlinear frequency upconversion process of high-harmonic generation (HHG) draws attention as it is capable of producing coherent EUV pulses with precise control of burst timing with respect to the driving near-infrared (NIR) femtosecond laser. In this report, we present and discuss our recent experimental data obtained by the plasmon-driven HHG method that generate EUV radiation by means of plasmonic nano-focusing of NIR femtosecond pulses. For experiment, metallic waveguides having a tapered hole of funnel shape inside were fabricated by adopting the focused-ion-beam process on a micro-cantilever substrate. The plasmonic field formed within the funnelwaveguides being coupled with the incident femtosecond pulse permitted intensity enhancement by a factor of ~350, which creates a hot spot of sub-wavelength size with intensities strong enough for HHG. Experimental results showed that with injection of noble gases into the funnel-waveguides, EUV radiation is generated up to wavelengths of 32 nm and 29.6 nm from Ar and Ne gas atoms, respectively. Further, it was observed that lower-order EUV harmonics are cut off in the HHG spectra by the tiny exit aperture of the funnel-waveguide.

Kr photoionized plasma induced by intense extreme ultraviolet pulses

NASA Astrophysics Data System (ADS)

Bartnik, A.; Wachulak, P.; Fiedorowicz, H.; Skrzeczanowski, W.

2016-04-01

Irradiation of any gas with an intense EUV (extreme ultraviolet) radiation beam can result in creation of photoionized plasmas. The parameters of such plasmas can be significantly different when compared with those of the laser produced plasmas (LPP) or discharge plasmas. In this work, the photoionized plasmas were created in a krypton gas irradiated using an LPP EUV source operating at a 10 Hz repetition rate. The Kr gas was injected into the vacuum chamber synchronously with the EUV radiation pulses. The EUV beam was focused onto a Kr gas stream using an axisymmetrical ellipsoidal collector. The resulting low temperature Kr plasmas emitted electromagnetic radiation in the wide spectral range. The emission spectra were measured either in the EUV or an optical range. The EUV spectrum was dominated by emission lines originating from Kr III and Kr IV ions, and the UV/VIS spectra were composed from Kr II and Kr I lines. The spectral lines recorded in EUV, UV, and VIS ranges were used for the construction of Boltzmann plots to be used for the estimation of the electron temperature. It was shown that for the lowest Kr III and Kr IV levels, the local thermodynamic equilibrium (LTE) conditions were not fulfilled. The electron temperature was thus estimated based on Kr II and Kr I species where the partial LTE conditions could be expected.

Solar Demon: near real-time Flare, Dimming and EUV wave monitoring

NASA Astrophysics Data System (ADS)

Kraaikamp, Emil; Verbeeck, Cis

Dimmings and EUV waves have been observed routinely in EUV images since 1996. They are closely associated with coronal mass ejections (CMEs), and therefore provide useful information for early space weather alerts. On the one hand, automatic detection and characterization of dimmings and EUV waves can be used to gain better understanding of the underlying physical mechanisms. On the other hand, every dimming and EUV wave provides extra information on the associated front side CME, and can improve estimates of the geo-effectiveness and arrival time of the CME. Solar Demon has been designed to detect and characterize dimmings, EUV waves, as well as solar flares in near real-time on Solar Dynamics Observatory/Atmospheric Imaging Assembly (SDO/AIA) data. The detection modules are running continuously at the Royal Observatory of Belgium on both quick-look data, as well as synoptic science data. The output of Solar Demon can be accessed in near real-time on the Solar Demon website, and includes images, movies, light curves, and the numerical evolution of several parameters. Solar Demon is the result of collaboration between the FP7 projects AFFECTS and COMESEP. Flare detections of Solar Demon are integrated into the COMESEP alert system. Here we present the Solar Demon detection algorithms and their output. We will show several interesting flare, dimming and EUV wave events, and present general statistics of the detections made so far during solar cycle 24.

EUV mirror based absolute incident flux detector

DOEpatents

Berger, Kurt W.

2004-03-23

A device for the in-situ monitoring of EUV radiation flux includes an integrated reflective multilayer stack. This device operates on the principle that a finite amount of in-band EUV radiation is transmitted through the entire multilayer stack. This device offers improvements over existing vacuum photo-detector devices since its calibration does not change with surface contamination.

Calibration techniques and results in the soft X-ray and extreme ultraviolet for components of the Extreme Ultraviolet Explorer Satellite

NASA Technical Reports Server (NTRS)

Malina, Roger F.; Jelinsky, Patrick; Bowyer, Stuart

1986-01-01

The calibration facilities and techniques for the Extreme Ultraviolet Explorer (EUVE) from 44 to 2500 A are described. Key elements include newly designed radiation sources and a collimated monochromatic EUV beam. Sample results for the calibration of the EUVE filters, detectors, gratings, collimators, and optics are summarized.

Challenges of anamorphic high-NA lithography and mask making

NASA Astrophysics Data System (ADS)

Hsu, Stephen D.; Liu, Jingjing

2017-06-01

Chip makers are actively working on the adoption of 0.33 numerical aperture (NA) EUV scanners for the 7-nm and 5-nm nodes (B. Turko, S. L. Carson, A. Lio, T. Liang, M. Phillips, et al., in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 977602 (2016) doi: 10.1117/12.2225014; A. Lio, in `Proc. SPIE9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97760V (2016) doi: 10.1117/12.2225017). In the meantime, leading foundries and integrated device manufacturers are starting to investigate patterning options beyond the 5-nm node (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022). To minimize the cost and process complexity of multiple patterning beyond the 5-nm node, EUV high-NA single-exposure patterning is a preferred method over EUV double patterning (O. Wood, S. Raghunathan, P. Mangat, V. Philipsen, V. Luong, et al., in `Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94220I (2015) doi: 10.1117/12.2085022; J. van Schoot, K. van Ingen Schenau, G. Bottiglieri, K. Troost, J. Zimmerman, et al., `Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97761I (2016) doi: 10.1117/12.2220150). The EUV high-NA scanner equipped with a projection lens of 0.55 NA is designed to support resolutions below 10 nm. The high-NA system is beneficial for enhancing resolution, minimizing mask proximity correction bias, improving normalized image log slope (NILS), and controlling CD uniformity (CDU). However, increasing NA from 0.33 to 0.55 reduces the depth of focus (DOF) significantly. Therefore, the source mask optimization (SMO) with sub-resolution assist features (SRAFs) are needed to increase DOF to meet the demanding full chip process control requirements (S. Hsu, R. Howell, J. Jia, H.-Y. Liu, K. Gronlund, et al., EUV `Proc. SPIE9048, Extreme Ultraviolet (EUV) Lithography VI', (2015) doi: 10.1117/12.2086074). To ensure no assist feature printing, the assist feature sizes need to be scaled with λ/NA. The extremely small SRAF width (below 25 nm on the reticle) is difficult to fabricate across the full reticle. In this paper, we introduce an innovative `attenuated SRAF' to improve SRAF manufacturability and still maintain the process window benefit. A new mask fabrication process is proposed to use existing mask-making capability to manufacture the attenuated SRAFs. The high-NA EUV system utilizes anamorphic reduction; 4× in the horizontal (slit) direction and 8× in the vertical (scanning) direction (J. van Schoot, K. van Ingen Schenau, G. Bottiglieri, K. Troost, J. Zimmerman, et al., `Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII', vol. 97761I (2016) doi: 10.1117/12.2220150; B. Kneer, S. Migura, W. Kaiser, J. T. Neumann, J. van Schoot, in `Proc. SPIE9422, Extreme Ultraviolet (EUV) Lithography VI', vol. 94221G (2015) doi: 10.1117/12.2175488). For an anamorphic system, the magnification has an angular dependency, and thus, familiar mask specifications such as mask error factor (MEF) need to be redefined. Similarly, mask-manufacturing rule check (MRC) needs to consider feature orientation.

75 FR 14468 - Carbazole Violet Pigment 23 From China and India

Federal Register 2010, 2011, 2012, 2013, 2014

2010-03-25

...)] Carbazole Violet Pigment 23 From China and India AGENCY: United States International Trade Commission... violet pigment 23 from India and the antidumping duty orders on carbazole violet pigment 23 from China and India. SUMMARY: The Commission hereby gives notice of the scheduling of expedited reviews pursuant...

Exploring EUV Spicules Using 304 Angstrom He II Data from SDO AIA

NASA Technical Reports Server (NTRS)

Snyder, Ian R.; Sterling, Alphonse C.; Falconer, David A.; Moore, Ron L.

2014-01-01

We present results from a statistical study of He II 304 Angstrom Extreme Ultraviolet (EUV) spicules at the limb of the Sun. We also measured properties of one macrospicule; macrospicules are longer than most spicules, and much broader in width than spicules. We use high-cadence (12 second) and high-resolution (0.6 arcseconds pixels) resolution data from the Atmospheric Imaging Array (AIA) instrument on the Solar Dynamic Observatory (SDO). All of the observed events occurred near the solar north pole, where quiet Sun or coronal hole environments ensued. We examined the maximum lengths, maximum rise velocities, and lifetimes of 33 Extreme Ultraviolet (EUV) spicules and the macrospicule. For the bulk of the Extreme Ultraviolet (EUV) spicules these quantities are, respectively, approximately 10,000-40,000 kilometers, 20-100 kilometers per second, and approximately 100- approximately 1000 seconds. For the macrospicule the corresponding quantities were respectively approximately 60,000 kilometers, approximately 130 kilometers per second, approximately 1800 seconds, which is typical of macrospicules measured by other workers. Therefore macrospicules are taller, longer-lived, and faster than most Extreme Ultraviolet (EUV) spicules. The rise profiles of both the spicules and the macrospicules match well a second-order ("parabolic" ) trajectory, although the acceleration was often weaker than that of solar gravity in the profiles fitted to the trajectories. Our macrospicule also had an obvious brightening at its base at birth, while such brightening was not apparent for the Extreme Ultraviolet (EUV) spicules. Most of the Extreme Ultraviolet (EUV) spicules remained visible during their descent back to the solar surface, although a small percentage of the spicules and the macrospicule faded out before falling back to the surface. Our sample of macrospicules is not yet large enough to determine whether their initiation mechanism is identical to that of Extreme Ultraviolet (EUV) spicules.

Novel EUV mask black border and its impact on wafer imaging

NASA Astrophysics Data System (ADS)

Kodera, Yutaka; Fukugami, Norihito; Komizo, Toru; Watanabe, Genta; Ito, Shin; Yoshida, Itaru; Maruyama, Shingo; Kotani, Jun; Konishi, Toshio; Haraguchi, Takashi

2016-03-01

EUV lithography is the most promising technology for semiconductor device manufacturing of the 10nm node and beyond. The EUV mask is a key element in the lithographic scanner optical path. The image border is a pattern free dark area around the die on the photomask serving as transition area between the parts of the mask that is shielded from the exposure light by the Reticle Masking (REMA) blades and the die. When printing a die at dense spacing on an EUV scanner, the EUV light reflection from the image border overlaps edges of neighboring dies, affecting CD and contrast in this area. To reduce this effect an etched multilayer type black border was developed, and it was demonstrated that CD impact at the edge of a die is strongly reduced with this type of the black border (BB). However, wafer printing result still showed some CD change influenced by the black border reflection. It was proven that the CD shift was caused by DUV Out of Band (OOB) light which is emitted from EUV light source. New types of a multilayer etched BB were evaluated and showed a good potential for DUV light suppression. In this study, a novel black border called Hybrid Black Border has been developed which allows to eliminate EUV and DUV OOB light reflection. Direct measurements of OOB light from HBB and Normal BB are performed on NXE:3300B ASML EUV scanner; it is shown that HBB OOB reflection is 3x lower than that of Normal BB. Finally, we state that HBB is a promising technology allowing for CD control at die edges.

Controlling contamination in Mo/Si multilayer mirrors by Si surface capping modifications

NASA Astrophysics Data System (ADS)

Malinowski, Michael E.; Steinhaus, Chip; Clift, W. Miles; Klebanoff, Leonard E.; Mrowka, Stanley; Soufli, Regina

2002-07-01

The performance of Mo/Si multilayer mirrors (MLMs) used to reflect UV (EUV) radiation in an EUV + hydrocarbon (NC) vapor environment can be improved by optimizing the silicon capping layer thickness on the MLM in order to minimize the initial buildup of carbon on MLMs. Carbon buildup is undesirable since it can absorb EUV radiation and reduce MLM reflectivity. A set of Mo/Si MLMs deposited on Si wafers was fabricated such that each MLM had a different Si capping layer thickness ranging form 2 nm to 7 nm. Samples from each MLM wafer were exposed to a combination of EUV light + (HC) vapors at the Advanced Light Source (ALS) synchrotron in order to determine if the Si capping layer thickness affected the carbon buildup on the MLMs. It was found that the capping layer thickness had a major influence on this 'carbonizing' tendency, with the 3 nm layer thickness providing the best initial resistance to carbonizing and accompanying EUV reflectivity loss in the MLM. The Si capping layer thickness deposited on a typical EUV optic is 4.3 nm. Measurements of the absolute reflectivities performed on the Calibration and Standards beamline at the ALS indicated the EUV reflectivity of the 3 nm-capped MLM was actually slightly higher than that of the normal, 4 nm Si-capped sample. These results show that he use of a 3 nm capping layer represents an improvement over the 4 nm layer since the 3 nm has both a higher absolute reflectivity and better initial resistance to carbon buildup. The results also support the general concept of minimizing the electric field intensity at the MLM surface to minimize photoelectron production and, correspondingly, carbon buildup in a EUV + HC vapor environment.

Prospects of DUV OoB suppression techniques in EUV lithography

NASA Astrophysics Data System (ADS)

Park, Chang-Min; Kim, Insung; Kim, Sang-Hyun; Kim, Dong-Wan; Hwang, Myung-Soo; Kang, Soon-Nam; Park, Cheolhong; Kim, Hyun-Woo; Yeo, Jeong-Ho; Kim, Seong-Sue

2014-04-01

Though scaling of source power is still the biggest challenge in EUV lithography (EUVL) technology era, CD and overlay controls for transistor's requirement are also precondition of adopting EUVL in mass production. Two kinds of contributors are identified as risks for CDU and Overlay: Infrared (IR) and deep ultraviolet (DUV) out of band (OOB) radiations from laser produced plasma (LPP) EUV source. IR from plasma generating CO2 laser that causes optics heating and wafer overlay error is well suppressed by introducing grating on collector to diffract IR off the optical axis and is the effect has been confirmed by operation of pre-production tool (NXE3100). EUV and DUV OOB which are reflected from mask black boarder (BB) are root causes of EUV-specific CD error at the boundaries of exposed shots which would result in the problem of CDU out of spec unless sufficiently suppressed. Therefore, control of DUV OOB reflection from the mask BB is one of the key technologies that must be developed prior to EUV mass production. In this paper, quantitative assessment on the advantage and the disadvantage of potential OOB solutions will be discussed. EUV and DUV OOB impacts on wafer CDs are measured from NXE3100 & NXE3300 experiments. Significant increase of DUV OOB impact on CD from NXE3300 compared with NXE3100 is observed. There are three ways of technology being developed to suppress DUV OOB: spectral purity filter (SPF) as a scanner solution, multi-layer etching as a solution on mask, and resist top-coating as a process solution. PROs and CONs of on-scanner, on-mask, and on-resist solution for the mass production of EUV lithography will be discussed.

Free-electron laser emission architecture impact on extreme ultraviolet lithography

NASA Astrophysics Data System (ADS)

Hosler, Erik R.; Wood, Obert R.; Barletta, William A.

2017-10-01

Laser-produced plasma (LPP) EUV sources have demonstrated ˜125 W at customer sites, establishing confidence in EUV lithography (EUVL) as a viable manufacturing technology. However, for extension to the 3-nm technology node and beyond, existing scanner/source technology must enable higher-NA imaging systems (requiring increased resist dose and providing half-field exposures) and/or EUV multipatterning (requiring increased wafer throughput proportional to the number of exposure passes). Both development paths will require a substantial increase in EUV source power to maintain the economic viability of the technology, creating an opportunity for free-electron laser (FEL) EUV sources. FEL-based EUV sources offer an economic, high-power/single-source alternative to LPP EUV sources. Should FELs become the preferred next-generation EUV source, the choice of FEL emission architecture will greatly affect its operational stability and overall capability. A near-term industrialized FEL is expected to utilize one of the following three existing emission architectures: (1) self-amplified spontaneous emission, (2) regenerative amplifier, or (3) self-seeding. Model accelerator parameters are put forward to evaluate the impact of emission architecture on FEL output. Then, variations in the parameter space are applied to assess the potential impact to lithography operations, thereby establishing component sensitivity. The operating range of various accelerator components is discussed based on current accelerator performance demonstrated at various scientific user facilities. Finally, comparison of the performance between the model accelerator parameters and the variation in parameter space provides a means to evaluate the potential emission architectures. A scorecard is presented to facilitate this evaluation and provides a framework for future FEL design and enablement for EUVL applications.

Evidence for a New Class of Extreme Ultraviolet Sources

NASA Technical Reports Server (NTRS)

Maoz, Dan; Ofek, Eran O.; Shemi, Amotz

1997-01-01

Most of the sources detected in the extreme ultraviolet (EUV; 100-600 A) by the ROSAT/WFC and EUVE all-sky surveys have been identified with active late-type stars and hot white dwarfs that are near enough to the Earth to escape absorption by interstellar gas. However, about 15 per cent of EUV sources are as yet unidentified with any optical counterparts. We examine whether the unidentified EUV sources may consist of the same population of late-type stars and white dwarfs. We present B and R photometry of stars in the fields of seven of the unidentified EUV sources. We detect in the optical the entire main-sequence and white dwarf population out to the greatest distances where they could still avoid absorption. We use color-magnitude diagrams to demonstrate that, in most of the fields, none of the observed stars has the colours and magnitudes of late-type dwarfs at distances less than 100 pc. Similarly, none of the observed stars is a white dwarf within 500 pc that is hot enough to be a EUV emitter. The unidentified EUV sources we study are not detected in X-rays, while cataclysmic variables, X-ray binaries, and active galactic nuclei generally are. We conclude that some of the EUV sources may be a new class of nearby objects, which are either very faint at optical bands or which mimic the colours and magnitudes of distant late-type stars or cool white dwarfs. One candidate for optically faint objects is isolated old neutron stars, slowly accreting interstellar matter. Such neutron stars are expected to be abundant in the Galaxy, and have not been unambiguously detected.

Method of fabricating reflection-mode EUV diffraction elements

DOEpatents

Naulleau, Patrick P.

2002-01-01

Techniques for fabricating a well-controlled, quantized-level, engineered surface that serves as substrates for EUV reflection multilayer overcomes problems associated with the fabrication of reflective EUV diffraction elements. The technique when employed to fabricate an EUV diffraction element that includes the steps of: (a) forming an etch stack comprising alternating layers of first and second materials on a substrate surface where the two material can provide relative etch selectivity; (b) creating a relief profile in the etch stack wherein the relief profile has a defined contour; and (c) depositing a multilayer reflection film over the relief profile wherein the film has an outer contour that substantially matches that of the relief profile. For a typical EUV multilayer, if the features on the substrate are larger than 50 nm, the multilayer will be conformal to the substrate. Thus, the phase imparted to the reflected wavefront will closely match that geometrically set by the surface height profile.

EUV spectroscopy of highly charged high Z ions in the Large Helical Device plasmas

NASA Astrophysics Data System (ADS)

Suzuki, C.; Koike, F.; Murakami, I.; Tamura, N.; Sudo, S.; Sakaue, H. A.; Nakamura, N.; Morita, S.; Goto, M.; Kato, D.; Nakano, T.; Higashiguchi, T.; Harte, C. S.; OʼSullivan, G.

2014-11-01

We present recent results on the extreme ultraviolet (EUV) spectroscopy of highly charged high Z ions in plasmas produced in the Large Helical Device (LHD) at the National Institute for Fusion Science. Tungsten, bismuth and lanthanide elements have recently been studied in the LHD in terms of their importance in fusion research and EUV light source development. In relatively low temperature plasmas, quasicontinuum emissions from open 4d or 4f subshell ions are predominant in the EUV region, while the spectra tend to be dominated by discrete lines from open 4s or 4p subshell ions in higher temperature plasmas. Comparative analyses using theoretical calculations and charge-separated spectra observed in an electron beam ion trap have been performed to achieve better agreement with the spectra measured in the LHD. As a result, databases on Z dependence of EUV spectra in plasmas have been widely extended.

Actinic imaging and evaluation of phase structures on EUV lithography masks

DOE Office of Scientific and Technical Information (OSTI.GOV)

Mochi, Iacopo; Goldberg, Kenneth; Huh, Sungmin

2010-09-28

The authors describe the implementation of a phase-retrieval algorithm to reconstruct phase and complex amplitude of structures on EUV lithography masks. Many native defects commonly found on EUV reticles are difficult to detect and review accurately because they have a strong phase component. Understanding the complex amplitude of mask features is essential for predictive modeling of defect printability and defect repair. Besides printing in a stepper, the most accurate way to characterize such defects is with actinic inspection, performed at the design, EUV wavelength. Phase defect and phase structures show a distinct through-focus behavior that enables qualitative evaluation of themore » object phase from two or more high-resolution intensity measurements. For the first time, phase of structures and defects on EUV masks were quantitatively reconstructed based on aerial image measurements, using a modified version of a phase-retrieval algorithm developed to test optical phase shifting reticles.« less

The Nature of the Flaring EUVE Companion to HD 43162

NASA Technical Reports Server (NTRS)

Kulkarni, Shrinivas R.

2005-01-01

The purpose of our program was to observe and characterize the companion to HD 43162, EUVE J0614-2354, which (serendipitously) experienced an enormous flare event during our EUVE observation of HD 43162, one of the nearby solar analogs that we observed during our survey of this population. Our observation was carried out and the data have been received and reduced. We are able to identify EUVE J0614-2354 in both the X-ray (EPIC MOS + PN) and the UV (OM) data, which provides a sub-arcsecond position for this source. Our findings are consistent with the analysis of Christian et al. (2003a,b), who identify EUVE J0614-2354 with a coronally-active M-dwarf star at distance d = 15 plus or minus 5pc. The X-ray spectrum from the EPIC data are also consistent with this identification.

Hemispherical Nature of EUV Shocks Revealed by SOHO, STEREO, and SDO Observations

NASA Technical Reports Server (NTRS)

Gopalswamy, Natchimuthuk; Nitta, N.; Akiyama, S.; Makela, P.; Yashiro, S.

2011-01-01

EUV wave transients associated with type II radio bursts are manifestation of CME-driven shocks in the solar corona. We use recent EUV wave observations from SOHO, STEREO, and SDO for a set of CMEs to show that the EUV transients have a spherical shape in the inner corona. We demonstrate this by showing that the radius of the EUV transient on the disk observed by one instrument is approximately equal to the height of the wave above the solar surface in an orthogonal view provided by another instrument. The study also shows that the CME-driven shocks often form very low in the corona at a heliocentric distance of 1.2 Rs, even smaller than the previous estimates from STEREO/CORl data (Gopalswamy et aI., 2009, Solar Phys. 259, 227). These results have important implications for the acceleration of solar energetic particles by CMEs

EUV wavefront metrology system in EUVA

NASA Astrophysics Data System (ADS)

Hasegawa, Takayuki; Ouchi, Chidane; Hasegawa, Masanobu; Kato, Seima; Suzuki, Akiyoshi; Sugisaki, Katsumi; Murakami, Katsuhiko; Saito, Jun; Niibe, Masahito

2004-05-01

An Experimental extreme ultraviolet (EUV) interferometer (EEI) using an undulator as a light source was installed in New SUBARU synchrotron facility at Himeji Institute of Technology (HIT). The EEI can evaluate the five metrology methods reported before. (1) A purpose of the EEI is to determine the most suitable method for measuring the projection optics of EUV lithography systems for mass production tools.

The extreme ultraviolet explorer archive

NASA Astrophysics Data System (ADS)

Polomski, E.; Drake, J. J.; Dobson, C.; Christian, C.

1993-09-01

The Extreme Ultrviolet Explorer (EUVE) public archive was created to handle the storage, maintenance, and distribution of EUVE data and ancillary documentation, information, and software. Access to the archive became available to the public on July 17, 1992, only 40 days after the launch of the EUVE satellite. A brief overview of the archive's contents and the various methods of access will be described.

EUV Coronal Waves: Atmospheric and Heliospheric Connections and Energetics

NASA Astrophysics Data System (ADS)

Patsourakos, S.

2015-12-01

Since their discovery in late 90's by EIT on SOHO, the study EUV coronal waves has been a fascinating andfrequently strongly debated research area. While it seems as ifan overall consensus has been reached about the nurture and nature of this phenomenon,there are still several important questions regarding EUV waves. By focusing on the most recentobservations, we will hereby present our current understanding about the nurture and nature of EUV waves,discuss their connections with other atmospheric and heliospheric phenomena (e.g.,flares and CMEs, Moreton waves, coronal shocks, coronal oscillations, SEP events) and finallyassess their possible energetic contribution to the overall budget of relatederuptive phenomena.

Molecular organometallic resists for EUV (MORE): Reactivity as a function of metal center (Bi, Sb, Te and Sn)

NASA Astrophysics Data System (ADS)

Sitterly, Jacob; Murphy, Michael; Grzeskowiak, Steven; Denbeaux, Greg; Brainard, Robert L.

2018-03-01

This paper describes the photoreactivity of six organometallic complexes of the type PhnMX2 containing bismuth, antimony and tellurium, where n = 3 for bismuth and antimony and n = 2 for tellurium, and where X = acetate (O2CCH3) or pivalate (O2CC(CH3)3). These compounds were exposed to EUV light to monitor photodecomposition via in situ mass spectral analysis of the primary outgassing products of CO2, benzene and phenol. This paper explores the effect of metal center and carboxylate ligand on the EUV reactivity of these EUV photoresists.

EUV spectroscopy of high-redshift x-ray objects

NASA Astrophysics Data System (ADS)

Kowalski, M. P.; Wolff, M. T.; Wood, K. S.; Barbee, T. W., Jr.; Barstow, M. A.

2010-07-01

As astronomical observations are pushed to cosmological distances (z>3) the spectral energy distributions of X-ray objects, AGN for example, will be redshifted into the EUV waveband. Consequently, a wealth of critical spectral diagnostics, provided by, for example, the Fe L-shell complex and the O VII/VIII lines, will be lost to future planned X-ray missions (e.g., IXO, Gen-X) if operated at traditional X-ray energies. This opens up a critical gap in performance located at short EUV wavelengths, where critical X-ray spectral transitions occur in high-z objects. However, normal-incidence multilayer-grating technology, which performs best precisely at such wavelengths, together with advanced nanolaminate replication techniques have been developed and are now mature to the point where advanced EUV instrument designs with performance complementary to IXO and Gen-X are practical. Such EUV instruments could be flown either independently or as secondary instruments on these X-ray missions. We present here a critical examination of the limits placed on extragalactic EUV measurements by ISM absorption, the range where high-z measurements are practical, and the requirements this imposes on next-generation instrument designs. We conclude with a discussion of a breakthrough technology, nanolaminate replication, which enables such instruments.

Registration performance on EUV masks using high-resolution registration metrology

NASA Astrophysics Data System (ADS)

Steinert, Steffen; Solowan, Hans-Michael; Park, Jinback; Han, Hakseung; Beyer, Dirk; Scherübl, Thomas

2016-10-01

Next-generation lithography based on EUV continues to move forward to high-volume manufacturing. Given the technical challenges and the throughput concerns a hybrid approach with 193 nm immersion lithography is expected, at least in the initial state. Due to the increasing complexity at smaller nodes a multitude of different masks, both DUV (193 nm) and EUV (13.5 nm) reticles, will then be required in the lithography process-flow. The individual registration of each mask and the resulting overlay error are of crucial importance in order to ensure proper functionality of the chips. While registration and overlay metrology on DUV masks has been the standard for decades, this has yet to be demonstrated on EUV masks. Past generations of mask registration tools were not necessarily limited in their tool stability, but in their resolution capabilities. The scope of this work is an image placement investigation of high-end EUV masks together with a registration and resolution performance qualification. For this we employ a new generation registration metrology system embedded in a production environment for full-spec EUV masks. This paper presents excellent registration performance not only on standard overlay markers but also on more sophisticated e-beam calibration patterns.

On the Absence of EUV Emission from Comet C/2012 S1 (ISON)

NASA Technical Reports Server (NTRS)

Bryans, Paul; Pesnell, W. Dean

2016-01-01

When the sungrazing comet C2012 S1 (ISON) made its perihelion passage within two solar radii of the Sun's surface, it was expected to be a bright emitter at extreme ultraviolet (EUV) wavelengths. However, despite solar EUV telescopes repointing to track the orbit of the comet, no emission was detected. This null result is interesting in its own right, offering the possibility of placing limits on the size and composition of the nucleus. We explain the lack of detection by considering the properties of the comet and the solar atmosphere that determine the intensity of EUV emission from sungrazing comets. By comparing these properties with those of sungrazing comet C2011 W3 (Lovejoy), which did emit in the EUV, we conclude that the primary factor resulting in non-detectable EUV emission from C2012 S1 (ISON) was an insufficiently large nucleus. We conclude that the radius of C2012 S1 (ISON) was at least a factor of four less than that of C2011 W3 (Lovejoy). This is consistent with white-light observations in the days before perihelion that suggested the comet was dramatically reducing in size on approach.

Optical element for full spectral purity from IR-generated EUV light sources

NASA Astrophysics Data System (ADS)

van den Boogaard, A. J. R.; Louis, E.; van Goor, F. A.; Bijkerk, F.

2009-03-01

Laser produced plasma (LLP) sources are generally considered attractive for high power EUV production in next generation lithography equipment. Such plasmas are most efficiently excited by the relatively long, infrared wavelengths of CO2-lasers, but a significant part of the rotational-vibrational excitation lines of the CO2 radiation will be backscattered by the plasma's critical density surface and consequently will be present as parasitic radiation in the spectrum of such sources. Since most optical elements in the EUV collecting and imaging train have a high reflection coefficient for IR radiation, undesirable heating phenomena at the resist level are likely to occur. In this study a completely new principle is employed to obtain full separation of EUV and IR radiation from the source by a single optical component. While the application of a transmission filter would come at the expense of EUV throughput, this technique potentially enables wavelength separation without loosing reflectance compared to a conventional Mo/Si multilayer coated element. As a result this method provides full spectral purity from the source without loss in EUV throughput. Detailed calculations on the principal of functioning are presented.

The EUV Helium Spectrum in the Quiet Sun: A By-Product of Coronal Emission?

NASA Technical Reports Server (NTRS)

Andretta, Vincenzo; DelZanna, Giulio; Jordan, Stuart D.; Oegerle, William (Technical Monitor)

2002-01-01

In this paper we test one of the mechanisms proposed to explain the intensities and other observed properties of the solar helium spectrum, and in particular of its Extreme-Ultraviolet (EUV) resonance lines. The so-called Photoionisation-Recombination (P-R) mechanism involves photoionisation of helium atoms and ions by EUV coronal radiation, followed by recombination cascades. We present calibrated measurements of EUV flux obtained with the two CDS spectrometers on board SOHO, in quiescent solar regions. We were able to obtain an essentially complete estimate of the total photoionizing flux in the wavelength range below 504 A (the photoionisation threshold for He(I)), as well as simultaneous measurements with the same instruments of the intensities of the strongest EUV helium lines: He(II) lambda304, He(I) lambda584, and He(I) lambda537. We find that there are not enough EUV photons to account for the observed helium line intensities. More specifically, we conclude that He(II) intensities cannot be explained by the P-R mechanism. Our results, however, leave open the possibility that the He(I) spectrum could be formed by the P-R mechanism, with the He(II) lambda304 line as a significant photoionizating source.

Compact and Light-Weight Solar Spaceflight Instrument Designs Utilizing Newly Developed Miniature Free-Standing Zone Plates: EUV Radiometer and Limb-Scanning Monochromator

NASA Astrophysics Data System (ADS)

Seely, J. F.; McMullin, D. R.; Bremer, J.; Chang, C.; Sakdinawat, A.; Jones, A. R.; Vest, R.

2014-12-01

Two solar instrument designs are presented that utilize newly developed miniature free-standing zone plates having interconnected Au opaque bars and no support membrane resulting in excellent long-term stability in space. Both instruments are based on a zone plate having 4 mm outer diameter and 1 to 2 degree field of view. The zone plate collects EUV radiation and focuses a narrow bandpass through a pinhole aperture and onto a silicon photodiode detector. As a miniature radiometer, EUV irradiance is accurately determined from the zone plate efficiency and the photodiode responsivity that are calibrated at the NIST SURF synchrotron facility. The EUV radiometer is pointed to the Sun and measures the absolute solar EUV irradiance in high time cadence suitable for solar physics and space weather applications. As a limb-scanning instrument in low earth orbit, a miniature zone-plate monochromator measures the extinction of solar EUV radiation by scattering through the upper atmosphere which is a measure of the variability of the ionosphere. Both instruments are compact and light-weight and are attractive for CubeSats and other missions where resources are extremely limited.

ON THE ABSENCE OF EUV EMISSION FROM COMET C/2012 S1 (ISON)

DOE Office of Scientific and Technical Information (OSTI.GOV)

Bryans, Paul; Pesnell, W. Dean

2016-05-10

When the sungrazing comet C/2012 S1 (ISON) made its perihelion passage within two solar radii of the Sun’s surface, it was expected to be a bright emitter at extreme ultraviolet (EUV) wavelengths. However, despite solar EUV telescopes repointing to track the orbit of the comet, no emission was detected. This “null result” is interesting in its own right, offering the possibility of placing limits on the size and composition of the nucleus. We explain the lack of detection by considering the properties of the comet and the solar atmosphere that determine the intensity of EUV emission from sungrazing comets. Bymore » comparing these properties with those of sungrazing comet C/2011 W3 (Lovejoy), which did emit in the EUV, we conclude that the primary factor resulting in non-detectable EUV emission from C/2012 S1 (ISON) was an insufficiently large nucleus. We conclude that the radius of C/2012 S1 (ISON) was at least a factor of four less than that of C/2011 W3 (Lovejoy). This is consistent with white-light observations in the days before perihelion that suggested the comet was dramatically reducing in size on approach.« less

Sample presentation, sources of error and future perspectives on the application of vibrational spectroscopy in the wine industry.

PubMed

Cozzolino, Daniel

2015-03-30

Vibrational spectroscopy encompasses a number of techniques and methods including ultra-violet, visible, Fourier transform infrared or mid infrared, near infrared and Raman spectroscopy. The use and application of spectroscopy generates spectra containing hundreds of variables (absorbances at each wavenumbers or wavelengths), resulting in the production of large data sets representing the chemical and biochemical wine fingerprint. Multivariate data analysis techniques are then required to handle the large amount of data generated in order to interpret the spectra in a meaningful way in order to develop a specific application. This paper focuses on the developments of sample presentation and main sources of error when vibrational spectroscopy methods are applied in wine analysis. Recent and novel applications will be discussed as examples of these developments. © 2014 Society of Chemical Industry.

Study on GaN nanostructures: Growth and the suppression of the yellow emission

NASA Astrophysics Data System (ADS)

Wang, Ting; Chen, Fei; Ji, Xiaohong; Zhang, Qinyuan

2018-07-01

GaN nanostructures were synthesized via a simple chemical vapor deposition using Ga2O3 and NH3 as precursors. Structural and morphological properties were systematically characterized by field emission scanning electron microscopy, X-ray diffractometer, transmission electron microscopy, and Raman spectroscopy. The configuration of GaN nanostructures was found to be strongly dependent on the growth temperature and the NH3 flow rate. Photoluminescence analysis revealed that all the fabricated GaN NSs exhibited a strong ultra-violet emission (∼364 nm), and the yellow emission of GaN nanorods can be suppressed at appropriate III/V ratio. The suppression of the yellow emission was attributed to the low density of surface or the VGa defect. The work demonstrates that the GaN nanostructures have potential applications in the optoelectronic and nanoelectronic devices.

Science highlights from MAVEN/IUVS after two years in Mars Orbit

NASA Astrophysics Data System (ADS)

Schneider, N. M.; Deighan, J.; Stiepen, A.; Jain, S.; Lefèvre, F.; Stevens, M. H.; Gröller, H.; Yelle, R. V.; Lo, D.; Evans, J. S.; Stewart, I. F.; Chaffin, M.; Crismani, M. M. J.; Mayyasi, M.; McClintock, W. E.; Holsclaw, G.; Clarke, J. T.; Montmessin, F.; Jakosky, B. M.

2016-12-01

The broad capabilities of the Imaging UltraViolet Spectrograph on the MAVEN mission are enabling new science ranging from Mars' lower atmosphere up though the escaping corona. After two years in Mars orbit, the instrument has yielded insights on present-day processes at Mars including dayglow, nightglow, aurora, meteor showers, clouds, and solar-planetary interactions. In this presentation we will highlight several new discoveries in the mesosphere and below. First, spatial mapping of nitric oxide nightglow reveals regions of atmospheric downwelling necessitating substantial changes to global atmospheric circulation models. Second, a new high-spatial-resolution UV imaging mode allows detection of clouds from nadir to limb and their local time evolution, as well as unprecedented determinations of Mars' low-altitude ozone. Finally, IUVS has obtained hundreds of stellar occultation profiles probing atmospheric structure, composition, waves and tides.

Photolytic AND Catalytic Destruction of Organic Waste Water Pollutants

NASA Astrophysics Data System (ADS)

Torosyan, V. F.; Torosyan, E. S.; Kryuchkova, S. O.; Gromov, V. E.

2017-01-01

The system: water supply source - potable and industrial water - wastewater - sewage treatment - water supply source is necessary for water supply and efficient utilization of water resources. Up-to-date technologies of waste water biological treatment require for special microorganisms, which are technologically complex and expensive but unable to solve all the problems. Application of photolytic and catalytically-oxidizing destruction is quite promising. However, the most reagents are strong oxidizers in catalytic oxidation of organic substances and can initiate toxic substance generation. Methodic and scientific approaches to assess bread making industry influence on the environment have been developed in this paper in order to support forecasting and taking technological decisions concerning reduction of this influence. Destructive methods have been tested: ultra violet irradiation and catalytic oxidation for extraction of organic compounds from waste water by natural reagents.

Giant Vehicles

NASA Technical Reports Server (NTRS)

Said, Magdi A; Schur, Willi W.; Gupta, Amit; Mock, Gary N.; Seyam, Abdelfattah M.; Theyson, Thomas

2004-01-01

Science and technology development from balloon-borne telescopes and experiments is a rich return on a relatively modest involvement of NASA resources. For the past three decades, the development of increasingly competitive and complex science payloads and observational programs from high altitude balloon-borne platforms has yielded significant scientific discoveries. The success and capabilities of scientific balloons are closely related to advancements in the textile and plastic industries. This paper will present an overview of scientific balloons as a viable and economical platform for transporting large telescopes and scientific instruments to the upper atmosphere to conduct scientific missions. Additionally, the paper sheds the light on the problems associated with UV degradation of high performance textile components that are used to support the payload of the balloon and proposes future research to reduce/eliminate Ultra Violet (UV) degradation in order to conduct long-term scientific missions.

Weakly ionized cosmic gas: Ionization and characterization

NASA Technical Reports Server (NTRS)

Rosenberg, M.; Mendis, D. A.; Chow, V. W.

1994-01-01

Since collective plasma behavior may determine important transport processes (e.g., plasma diffusion across a magnetic field) in certain cosmic environments, it is important to delineate the parameter space in which weakly ionized cosmic gases may be characterized as plasmas. In this short note, we do so. First, we use values for the ionization fraction given in the literature, wherein the ionization is generally assumed to be due primarily to ionization by cosmic rays. We also discuss an additional mechanism for ionization in such environments, namely, the photoelectric emission of electrons from cosmic dust grains in an interstellar Far Ultra Violet (FUV) radiation field. Simple estimates suggest that under certain conditions this mechanism may dominate cosmic ray ionization, and possibly also the photoionization of metal atoms by the interstellar FUV field, and thereby lead to an enhanced ionization level.

Near band edge photoluminescence of ZnO nanowires: Optimization via surface engineering

NASA Astrophysics Data System (ADS)

Yan, Danhua; Zhang, Wenrui; Cen, Jiajie; Stavitski, Eli; Sadowski, Jerzy T.; Vescovo, Elio; Walter, Andrew; Attenkofer, Klaus; Stacchiola, Darío J.; Liu, Mingzhao

2017-12-01

Zinc oxide (ZnO) nanowire arrays have potential applications for various devices such as ultra-violet light emitting diodes and lasers, where photoluminescence of intense near band edge emission without defect emissions is usually desired. Here, we demonstrate, counter-intuitively, that the near band edge emission may become dominant by introducing certain surface defects to ZnO nanowires via surface engineering. Specifically, near band edge emission (NBE) is effectively enhanced after a low pressure O2 plasma treatment that sputters off surface oxygen species to produce a reduced and oxygen vacancy-rich surface. The effect is attributed to the lowered surface valence band maximum of the reduced ZnO surface that creates an accumulative band bending, which screens the photo-generated minority carriers (holes) from reaching or being trapped by the surface defects.

Investigation on Structural and Optical Properties of Copper Telluride Thin Films with Different Annealing Temperature

NASA Astrophysics Data System (ADS)

Nishanthini, R.; Muthu Menaka, M.; Pandi, P.; Bahavan Palani, P.; Neyvasagam, K.

The copper telluride (Cu2Te) thin film of thickness 240nm was coated on a microscopic glass substrate by thermal evaporation technique. The prepared films were annealed at 150∘C and 250∘C for 1h. The annealing effect on Cu2Te thin films was examined with different characterization methods like X-ray Diffraction Spectroscopy (XRD), Scanning Electron Microscopy (SEM), Ultra Violet-Visible Spectroscopy (UV-VIS) and Photoluminescence (PL) Spectroscopy. The peak intensities of XRD spectra were increased while increasing annealing temperature from 150∘C to 250∘C. The improved crystallinity of the thin films was revealed. However, the prepared films are exposed complex structure with better compatibility. Moreover, the shift in band gap energy towards higher energies (blue shift) with increasing annealing temperature is observed from the optical studies.